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Sample records for su-8 negative photoresist

  1. SU-8 negative photoresist for optical mask manufacturing

    Science.gov (United States)

    Bogdanov, Alexei L.

    2000-06-01

    The requirements for better control, linearity, and uniformity of critical dimension (CD) on photomasks in fabrication of 180 and 150 nm generation devices result in increasing demand for thinner, more etching durable, and more sensitive e-beam resists. Novolac based resists with chemical amplification have been a choice for their sensitivity and stability during etching. However, difficult CD control due to the acid catalyzer diffusion and quite narrow post exposure bake (PEB) process window are some of the major drawbacks of these resists. SU-8 is recently introduced to the market negative photoresist. High sensitivity, fairly good adhesion properties, and relatively simple processing of SU-8 make it a good substitution for novolac based chemically amplified negative e-beam resists in optical mask manufacturing. The replacement of traditional chemically amplified resists by SU- 8 can increase the process latitude and reduce resist costs. Among the obvious drawbacks of SU-8 are the use of solvent- based developer and demand of oxygen plasma for resist removal. In this paper the use of SU-8 for optical mask manufacturing is reported. All steps of resist film preparation, exposure and development are paid a share of attention. Possibilities to use reactive ion etching (RIE) with oxygen in order to increase resist mask contrast are discussed. Special exposure strategy (pattern outlining) was employed to further improve the edge definition. The resist PEB temperature and time were studied to estimate their weight in overall CD control performance. Specially designed test patterns with 0.25 micrometer design rule could be firmly transferred into a chromium layer both by wet etching and ion milling. Influence of exposure dose variation on the pattern CD change was studied.

  2. SU-8 photoresist-derived electrospun carbon nanofibres as high ...

    Indian Academy of Sciences (India)

    ... Refresher Courses · Symposia · Live Streaming. Home; Journals; Bulletin of Materials Science; Volume 40; Issue 3. SU-8 photoresist-derived electrospun carbon nanofibres as high-capacity anode material for lithium ion battery. M KAKUNURI S KAUSHIK A SAINI C S SHARMA. Volume 40 Issue 3 June 2017 pp 435-439 ...

  3. Functionalization of SU-8 photoresist surfaces with IgG proteins

    International Nuclear Information System (INIS)

    Blagoi, Gabriela; Keller, Stephan; Johansson, Alicia; Boisen, Anja; Dufva, Martin

    2008-01-01

    The negative epoxy-based photoresist SU-8 has a variety of applications within microelectromechanical systems (MEMS) and lab-on-a-chip systems. Here, several methods to functionalize SU-8 surfaces with IgG proteins were investigated. Fluorescent labeled proteins and fluorescent sandwich immunoassays were employed to characterize the binding efficiency of model proteins to bare SU-8 surface, SU-8 treated with cerium ammonium nitrate (CAN) etchant and CAN treated surfaces modified by aminosilanization. The highest binding capacity of antibodies was observed on bare SU-8. This explains why bare SU-8 in a functional fluorescent sandwich immunoassay detecting C-reactive protein (CRP) gave twice as high signal as compared with the other two surfaces. Immunoassays performed on bare SU-8 and CAN treated SU-8 resulted in detection limits of CRP of 30 and 80 ng/ml respectively which is sufficient for detecting CRP in clinical samples, where concentrations of 3-10 μg/ml are normal for healthy individuals. In conclusion, bare SU-8 and etched SU-8 can be modified with antibodies by a simple adsorption procedure which simplifies building lab-on-a-chip systems in SU-8. Additionally, we report the fabrication process and use of microwells created in a SU-8 layer with the same dimensions as a standard microscope glass slide that could fit into fluorescent scanners. The SU-8 microwells minimize the reagent consumption and are straightforward to handle compared to SU-8 coated microscope slides

  4. Surface Modification of Photoresist SU-8 for Low Autofluorescence and Bioanalytical Applications

    DEFF Research Database (Denmark)

    Cao, Cuong; Birtwell, Sam W.; Høgberg, Jonas

    2011-01-01

    This paper reports a surface modification of epoxy-based negative photoresist SU-8 for reducing its autofluorescence while enhancing its biofunctionality. By covalently depositing a thin layer of 20 nm Au nanoparticles (AuNPs) onto the SU-8 surface, we found that the AuNPs-coated SU-8 surface...... is much less fluorescent than the untreated SU-8. Moreover, DNA probes can easily be immobilized on the Au surface and are thermally stable over a wide range of temperature. These improvements will benefit bioanalytical applications such as DNA hybridization and solid-phase PCR (SP-PCR)....

  5. Fabricating microfluidic valve master molds in SU-8 photoresist

    Science.gov (United States)

    Dy, Aaron J.; Cosmanescu, Alin; Sluka, James; Glazier, James A.; Stupack, Dwayne; Amarie, Dragos

    2014-05-01

    Multilayer soft lithography has become a powerful tool in analytical chemistry, biochemistry, material and life sciences, and medical research. Complex fluidic micro-circuits require reliable components that integrate easily into microchips. We introduce two novel approaches to master mold fabrication for constructing in-line micro-valves using SU-8. Our fabrication techniques enable robust and versatile integration of many lab-on-a-chip functions including filters, mixers, pumps, stream focusing and cell-culture chambers, with in-line valves. SU-8 created more robust valve master molds than the conventional positive photoresists used in multilayer soft lithography, but maintained the advantages of biocompatibility and rapid prototyping. As an example, we used valve master molds made of SU-8 to fabricate PDMS chips capable of precisely controlling beads or cells in solution.

  6. Fabricating microfluidic valve master molds in SU-8 photoresist

    International Nuclear Information System (INIS)

    Dy, Aaron J; Cosmanescu, Alin; Sluka, James; Glazier, James A; Amarie, Dragos; Stupack, Dwayne

    2014-01-01

    Multilayer soft lithography has become a powerful tool in analytical chemistry, biochemistry, material and life sciences, and medical research. Complex fluidic micro-circuits require reliable components that integrate easily into microchips. We introduce two novel approaches to master mold fabrication for constructing in-line micro-valves using SU-8. Our fabrication techniques enable robust and versatile integration of many lab-on-a-chip functions including filters, mixers, pumps, stream focusing and cell-culture chambers, with in-line valves. SU-8 created more robust valve master molds than the conventional positive photoresists used in multilayer soft lithography, but maintained the advantages of biocompatibility and rapid prototyping. As an example, we used valve master molds made of SU-8 to fabricate PDMS chips capable of precisely controlling beads or cells in solution. (technical note)

  7. SU-8 photoresist and SU-8 based nanocomposites for broadband acoustical matching at 1 GHz

    Energy Technology Data Exchange (ETDEWEB)

    Ndieguene, A; Campistron, P; Carlier, J; Wang, S; Callens-Debavelaere, D; Nongaillard, B, E-mail: Assane.Ndieguene@meletu.univ-valenciennes.f [Univ Lille Nord de France, F-59000 Lille (France)

    2009-11-01

    So as to integrate acoustic functions in BioMEMS using 1 GHz ZnO transducers deposited on silicon substrates, acoustic waves propagation through the silicon substrate and its transmission in water needs to be maximized (the insertion losses at the Si / water interface are about 6dB). In the context of integration, it is interesting for mechanical impedance matching to use photosensitive materials such as SU-8 so that patterns may be obtained. Nanocomposite materials based on SU-8 mixed with nanoparticles having adequate impedances were fabricated. These new materials are characterized in terms of their acoustic velocity, impedance and attenuation. For this, the nanocomposite layers are deposited on the substrate by spin coating to obtain a thickness of about 10 {mu}m, in order to separate acoustic echoes from the material (even if {lambda}/4 layer thickness is lower than 1 {mu}m). The insertion losses of the device immersed in water can be simulated as a function of frequency for a given reflection coefficient between the silicon substrate and the photoresist. The characteristics of some nanocomposites made with SU-8 and various concentrations of nanoparticles like Ti0{sub 2}, SrTiO{sub 3} or W have been determined.

  8. Micro-scale metallization on flexible polyimide substrate by Cu electroplating using SU-8 photoresist mask

    International Nuclear Information System (INIS)

    Cho, S.H.; Kim, S.H.; Lee, N.-E.; Kim, H.M.; Nam, Y.W.

    2005-01-01

    Technologies for flexible electronics have been developed to make electronic or microelectromechanical (MEMS) devices on inexpensive and flexible organic substrates. In order to fabricate the interconnect lines between device elements or layers in flexible electronic devices, metallization on the flexible substrate is essential. In this case, the width and conductivity of metallization line are very important for minimizing the size of device. Therefore, the realization of metallization process with the scale of a few micrometers on the flexible substrate is required. In this work, micro-scale metallization lines of Cu were fabricated on the flexible substrate by electroplating using the patterned mask of a negative-tone SU-8 photoresist. Polyimide surface was treated by O 2 /Ar atmospheric plasma for the improvement in adhesion between Cr layer and polyimide and in situ sputter deposition of 100-nm-thick Cu seed layers on the sputter-deposited 50-nm-thick Cr adhesion layer was followed. SU-8 photoresist was spin-coated and patterned by photolithography. Electroplating of Cu line, removal of SU-8, and selective wet etch of Cr adhesion and Cu seed layers were carried out. Gap between the Cu lines was successfully filled by spin-coating of polyimide. Micro-scale Cu metal lines with gap filling on the polyimide substrate with a thickness of 6-12 μm and an aspect ratio of 1-3 were successfully fabricated

  9. Using an SU-8 Photoresist Structure and Cytochrome C Thin Film Sensing Material for a Microbolometer

    Directory of Open Access Journals (Sweden)

    Guo-Dung John Su

    2012-11-01

    Full Text Available There are two critical parameters for microbolometers: the temperature coefficient of resistance (TCR of the sensing material, and the thermal conductance of the insulation structure. Cytochrome c protein, having a high TCR, is a good candidate for infrared detection. We can use SU-8 photoresist for the thermal insulation structure, given its low thermal conductance. In this study, we designed a platform structure based on a SU-8 photoresist. We fabricated an infrared sensing pixel and recorded a high TCR for this new structure. The SU-8 photoresist insulation structure was fabricated using the exposure dose method. We experimentally demonstrated high values of TCR from 22%/K to 25.7%/K, and the measured noise was 1.2 × 10–8 V2/Hz at 60 Hz. When the bias current was 2 μA, the calculated voltage responsivity was 1.16 × 105 V/W. This study presents a new kind of microbolometer based on cytochrome c protein on top of an SU-8 photoresist platform that does not require expensive vacuum deposition equipment.

  10. Effects of temperature on mechanical properties of SU-8 photoresist material

    Energy Technology Data Exchange (ETDEWEB)

    Chung, Soon Wan; Park, Seung Bae [State University of New York, New York (United States)

    2013-09-15

    A representative fabrication processing of SU-8 photoresist, Ultraviolet (UV) lithography is usually composed of spin coat, soft bake, UV exposure, post exposure bake (PEB), development and optional hard bake, etc. The exposed region of SU-8 is crosslinked during the PEB process and its physical properties highly depend on UV exposure and PEB condition. This work was initiated to investigate if thermal baking after fabrication can affect the mechanical properties of SU-8 photoresist material because SU-8 is trying to be used as a structural material for MEMS operated at high temperature. Since a temperature of 95 .deg. C is normally recommended for PEB process, elevated temperatures up to 200 .deg. C were considered for the optional hard bake process. The viscoelastic material properties were measured by dynamic mechanical analyses (DMA). Also, pulling tests were performed to obtain Young's modulus and Poisson's ratio as a function of strain rate in a wide temperature range. From this study, the effects of temperature on the elastic and viscoelastic material properties of SU-8 were obtained.

  11. Effects of temperature on mechanical properties of SU-8 photoresist material

    International Nuclear Information System (INIS)

    Chung, Soon Wan; Park, Seung Bae

    2013-01-01

    A representative fabrication processing of SU-8 photoresist, Ultraviolet (UV) lithography is usually composed of spin coat, soft bake, UV exposure, post exposure bake (PEB), development and optional hard bake, etc. The exposed region of SU-8 is crosslinked during the PEB process and its physical properties highly depend on UV exposure and PEB condition. This work was initiated to investigate if thermal baking after fabrication can affect the mechanical properties of SU-8 photoresist material because SU-8 is trying to be used as a structural material for MEMS operated at high temperature. Since a temperature of 95 .deg. C is normally recommended for PEB process, elevated temperatures up to 200 .deg. C were considered for the optional hard bake process. The viscoelastic material properties were measured by dynamic mechanical analyses (DMA). Also, pulling tests were performed to obtain Young's modulus and Poisson's ratio as a function of strain rate in a wide temperature range. From this study, the effects of temperature on the elastic and viscoelastic material properties of SU-8 were obtained.

  12. Surface modification of SU8 photoresist for shrinkage improvement in a monolithic MEMS microstructure

    Science.gov (United States)

    Chung, C. K.; Hong, Y. Z.

    2007-02-01

    The effect of O2 plasma treatment on the surface property of exposed and unexposed SU8 photoresist has been investigated for the fabrication of a monolithic MEMS microstructure. It can solve the non-uniformity problem of second resist coating on the SU8 with high intrinsic shrinkage after exposure and post-exposure baking (PEB) in the fabrication of the stacked polymer-metal or polymer-polymer structure, which was used in the application of microfluid, bio and chemistry. The thickness difference of untreated SU8 before PEB between the exposed and unexposed SU8 was about 0.3% while that after PEB increased to about 6%. It could result in large non-uniformity of about 18 µm thickness difference for the following second resist coating on the hydrophobic surface without plasma treatment. The surface property of SU8 in terms of the contact angle and surface energy can be adjusted by O2 plasma treatment for enhancing the coating uniformity of the following resist. The measured contact angles of the exposed and unexposed SU8 decrease with O2 plasma time, corresponding to the increased surface energy determined by the Lifshitz-van der Waals/Lewis acid-base approach. It displayed that the similar hydrophilic surface property can minimize the thickness difference of second resist coating on the first shrunken SU8. A monolithic nozzle plate with a physical resolution of 600 dpi in a single column was demonstrated for an inkjet application based on the improved uniformity.

  13. A superhydrophobic chip based on SU-8 photoresist pillars suspended on a silicon nitride membrane

    KAUST Repository

    Marinaro, Giovanni; Accardo, Angelo; De Angelis, Francesco; Dane, Thomas; Weinhausen, Britta; Burghammer, Manfred; Riekel, Christian

    2014-01-01

    We developed a new generation of superhydrophobic chips optimized for probing ultrasmall sample quantities by X-ray scattering and fluorescence techniques. The chips are based on thin Si3N4 membranes with a tailored pattern of SU-8 photoresist pillars. Indeed, aqueous solution droplets can be evaporated and concentrated at predefined positions using a non-periodic pillar pattern. We demonstrated quantitatively the deposition and aggregation of gold glyconanoparticles from the evaporation of a nanomolar droplet in a small spot by raster X-ray nanofluorescence. Further, raster nanocrystallography of biological objects such as rod-like tobacco mosaic virus nanoparticles reveals crystalline macro-domain formation composed of highly oriented nanorods. © 2014 the Partner Organisations.

  14. A superhydrophobic chip based on SU-8 photoresist pillars suspended on a silicon nitride membrane

    KAUST Repository

    Marinaro, Giovanni

    2014-07-28

    We developed a new generation of superhydrophobic chips optimized for probing ultrasmall sample quantities by X-ray scattering and fluorescence techniques. The chips are based on thin Si3N4 membranes with a tailored pattern of SU-8 photoresist pillars. Indeed, aqueous solution droplets can be evaporated and concentrated at predefined positions using a non-periodic pillar pattern. We demonstrated quantitatively the deposition and aggregation of gold glyconanoparticles from the evaporation of a nanomolar droplet in a small spot by raster X-ray nanofluorescence. Further, raster nanocrystallography of biological objects such as rod-like tobacco mosaic virus nanoparticles reveals crystalline macro-domain formation composed of highly oriented nanorods. © 2014 the Partner Organisations.

  15. A new fabrication process for uniform SU-8 thick photoresist structures by simultaneously removing edge bead and air bubbles

    International Nuclear Information System (INIS)

    Lee, Hun; Lee, Kangsun; Ahn, Byungwook; Xu, Jing; Xu, Linfeng; Oh, Kwang W

    2011-01-01

    This paper proposes a new SU-8 fabrication process to simultaneously remove edge bead and tiny air bubbles by spraying out edge bead removal (EBR) fluid over the entire surface of photoresist. In particular, the edge bead and air bubbles can cause an air gap between a film mask and a photoresist surface during UV exposure. The diffraction effect of UV light by the air gap leads to inaccurate and non-uniform SU-8 patterns. In this study, we demonstrate a simple method using EBR treatment to simultaneously eliminate the edge bead at the edge of wafer and tiny air bubbles inside SU-8. The profiles of thickness variation of SU-8 films with/without the EBR treatment are measured. The results show that the proposed EBR treatment can successfully remove the edge bead and air bubbles over the entire SU-8 films. The average pattern uniformity of SU-8 is improved from 50.5% to 11.3% in the case of 200 µm thickness. This method is simple and inexpensive, compared to a standard EBR process, because it does not require specialized equipment and it can be applied regardless of substrate geometry (e.g. circular wafer and rectangular slide glass).

  16. Functionalization of SU-8 Photoresist Surfaces with IgG Proteins

    DEFF Research Database (Denmark)

    Blagoi, Gabriela; Keller, Stephan Urs; Johansson, Alicia

    2008-01-01

    immunoassays were employed to characterize the binding efficiency of model proteins to bare SU-8 surface, SU-8 treated with cerium ammonium nitrate (CAN) etchant and CAN treated surfaces modified by aminosilanization. The highest binding capacity of antibodies was observed on bare SU-8. This explains why bare...... SU-8 in a functional fluorescent sandwich immunoassay detecting C-reactive protein (CRP) gave twice as high signal as compared with the other two surfaces. Immunoassays performed on bare SU-8 and CAN treated SU-8 resulted in detection limits of CRP of 30 and 80 ng/ml respectively which is sufficient...... for detecting CRP in clinical samples, where concentrations of 3–10 μg/ml are normal for healthy individuals. In conclusion, bare SU-8 and etched SU-8 can be modified with antibodies by a simple adsorption procedure which simplifies building lab-on-a-chip systems in SU-8. Additionally, we report the fabrication...

  17. Order of multiphoton excitation of sulfonium photo-acid generators used in photoresists based on SU-8

    Science.gov (United States)

    Williams, Henry E.; Diaz, Carlos; Padilla, Gabriel; Hernandez, Florencio E.; Kuebler, Stephen M.

    2017-06-01

    Multiphoton lithography (MPL), Z-scan spectroscopy, and quantum chemical calculations were employed to investigate the order of multiphoton excitation that occurs when femtosecond laser pulses are used to excite two sulfonium photo-acid generators (PAGs) commonly used in photoresists based on the cross-linkable epoxide SU-8. The mole-fractions of the mono- and bis-sulfonium forms of these PAGs were determined for the commercially available photoresist SU-8 2075 and for the PAGs alone from a separate source. Both were found to contain similar fractions of the mono- and bis-forms, with the mono form present in the majority. Reichert's method was used to determine the solvatochromic strength of the SU-8 matrix, so that results obtained for the PAGs in SU-8 and in solution could be reliably compared. The PAGs were found to exhibit a minimal solvatochromic shift for a series of solvents that span across the solvatochromic strength of SU-8 itself. Sub-micron-sized features were fabricated in SU-8 2075 by MPL using amplified and continuous-wave mode-locked laser pulses. Analysis of the features as a function of average laser power, scan speed, and excitation wavelength shows that the PAGs can be activated by both two- and three-photon absorption (2PA and 3PA). Which activation mode dominates depends principally upon the excitation wavelength because the average laser powers that can be used with the photoresist are limited by practical considerations. The power must be high enough to effect sufficient cross-linking, yet not so high as to exceed the damage threshold of the material. When the laser pulses have a duration on the order of 100 fs, 3PA dominates at wavelengths near 800 nm, whereas 2PA becomes dominant at wavelengths below 700 nm. These findings are corroborated by open-aperture Z-scan measurements and quantum chemical calculations of the cross-sections for 2PA and 3PA as a function of wavelength.

  18. Electroplating moulds using dry film thick negative photoresist

    Science.gov (United States)

    Kukharenka, E.; Farooqui, M. M.; Grigore, L.; Kraft, M.; Hollinshead, N.

    2003-07-01

    This paper reports on progress on the feasibility of fabricating moulds for electroplating using Ordyl P-50100 (negative) acrylate polymer based dry film photoresist, commercially available from Elga Europe (http://www.elgaeurope.it). We used this photoresist as an alternative to SU8 negative epoxy based photoresist, which is very difficult to process and remove after electroplating (Lorenz et al 1998 Microelectron. Eng. 41/42 371-4, Eyre et al 1998 Proc. MEMS'98 (Heidelberg) (Piscataway, NJ: IEEE) pp 218-22). Ordyl P-50100 is easy to work with and can be easily removed after processing. A single layer of Ordyl P-50100 was deposited by lamination up to 20 µm thickness. Thicker layers (200 µm and more) can be achieved with multilayer lamination using a manual laminator. For our applications we found that Ordyl P-50100 dry film photoresist is a very good alternative to SU8 for the realization of 100 µm high moulds. The results presented will open up new possibilities for low-cost LIGA-type processes for MEMS applications.

  19. Novel method for chemical modification and patterning of the SU-8 photoresist

    DEFF Research Database (Denmark)

    Blagoi, Gabriela; Keller, Stephan Urs; Boisen, Anja

    2007-01-01

    the wetting behaviour of SU-8. The resolution limit of the AQ photopatterning method was 20 μm when using an uncollimated light source. AQ modification followed by a reaction with amino groups of Alexa-647 cadaverine and a Biotin-amino derivative proved possible modification and patterning of polymeric...

  20. Tailoring the mechanical properties of SU-8/clay nanocomposites: polymer microcantilever fabrication perspective

    CSIR Research Space (South Africa)

    Chen, H

    2014-03-01

    Full Text Available SU-8/Clay nanocomposite is considered as a candidate material for microcantilever sensor fabrication. Organically modified montmorillonite clay nanoparticles are dispersed in the universally used negative photoresist polymer SU-8, for a low cost...

  1. Gold Nanoparticles-Coated SU-8 for Sensitive Fluorescence-Based Detections of DNA

    DEFF Research Database (Denmark)

    Cao, Cuong; Birtwell, Sam W.; Høgberg, Jonas

    2012-01-01

    SU-8 epoxy-based negative photoresist has been extensively employed as a structural material for fabrication of numerous biological microelectro-mechanical systems (Bio-MEMS) or lab-on-a-chip (LOC) devices. However, SU-8 has a high autofluorescence level that limits sensitivity of microdevices...... for various Bio-MEMs and LOC devices that use SU-8 as a structural material....

  2. Giant negative photoresistance of ZnO single crystals

    Energy Technology Data Exchange (ETDEWEB)

    Barzola-Quiquia, Jose; Esquinazi, Pablo [Division of Superconductivity and Magnetism, University of Leipzig (Germany); Heluani, Silvia [Laboratorio de Fisica del Solido, FCEyT, Universidad Nacional de Tucuman, 4000 S. M. de Tucuman (Argentina); Villafuerte, Manuel [Dept. de Fisica, FCEyT, Universidad Nacional de Tucuman (Argentina); CONICET, Tucuman (Argentina); Poeppl, Andreas [Division of Magnetic Resonance of Complex Quantum Solids, University of Leipzig, D-04103 Leipzig (Germany)

    2011-07-01

    ZnO is a wide band gap semiconductor exhibiting the largest charge-carrier mobility among oxides. ZnO is a material with potential applications for short-wavelength optoelectronic devices, as a blue light emitting diodes and in spintronics. In this contribution we have measured the temperature dependence (30 K < T < 300 K) of the electrical resistance of ZnO single crystals prepared by hydrothermal method in darkness and under the influence of light in the ultraviolet range. The resistance decreases several orders of magnitude at temperatures T < 200 K after illumination. Electron paramagnetic resonance studies under illumination reveal that the excitation of Li acceptor impurities is the origin for the giant negative photoresistance effect. Permanent photoresistance effect is also observed, which remains many hours after leaving the crystal in darkness.

  3. Spray-coatable negative photoresist for high topography MEMS applications

    International Nuclear Information System (INIS)

    Arnold, Markus; Haas, Sven; Schwenzer, Falk; Schwenzer, Gunther; Reuter, Danny; Geßner, Thomas; Voigt, Anja; Gruetzner, Gabi

    2017-01-01

    In microsystem technology, the lithographical processing of substrates with a topography is very important. Interconnecting lines, which are routed over sloped topography sidewalls from the top of the protecting wafer to the contact pads of the device wafer, are one example of patterning over a topography. For structuring such circuit paths, a photolithography process, and therefore a process for homogeneous photoresist coating, is required. The most flexible and advantageous way of depositing a homogeneous photoresist film over structures with high topography steps is spray-coating. As a pattern transfer process for circuit paths in cavities, the lift-off process is widely used. A negative resist, like ma-N (MRT) or AZnLOF (AZ) is favoured for lift-off processes due to the existing negative angle of the sidewalls. Only a few sprayable negative photoresists are commercially available. In this paper, the development of a novel negative resist spray-coating based on a commercially available single-layer lift-off resist for spin-coating, especially for the patterning of structures inside the cavity and on the cavity wall, is presented. A variety of parameters influences the spray-coating process, and therefore the patterning results. Besides the spray-coating tool and the parameters, the composition of the resist solution itself also influences the coating results. For homogeneous resist coverage over the topography of the substrate, different solvent combinations for diluting the resist solution, different chuck temperatures during the coating process, and also the softbake conditions, are all investigated. The solvent formulations and the process conditions are optimized with respect to the homogeneity of the resist coverage on the top edge of the cavities. Finally, the developed spray-coating process, the resist material and the process stability are demonstrated by the following applications: (i) lift-off, (ii) electroplating, (iii) the wet and (iv) the dry

  4. Special Issue: 15 Years of SU8 as MEMS Material

    Directory of Open Access Journals (Sweden)

    Arnaud Bertsch

    2015-06-01

    Full Text Available In 1997, the first paper using SU-8 as a material for microfabrication was published [1], demonstrating the interest of this negative photoresist for the near-UV structuration of thick layers and the manufacturing of high aspect-ratio components.[...

  5. MICROSTRUCTURING OF SU-8 RESIST FOR MEMS AND BIO-APPLICATIONS

    OpenAIRE

    Dey, P.K.; Pramanick, B.; RaviShankar, A.; Ganguly, P.; Das, S.

    2017-01-01

    Some studies on the fabrication of micro-needles, micro-pillers, and micro-channels using SU-8 negative photoresist for MEMS and bio-applications are reported. The SU-8 processing technology was standardized for the purpose. Micro-pillars were fabricated on SU-8 polymer by soft lithographic technique. Micro-needles were realized on SU-8 film utilizing lensing effect of the etched groove structure of the glass substrate. Micro-channel was fabricated by molding of PDMS polymer on patterned SU-8...

  6. Investigation of a novel approach for the cross-linking characterization of SU-8 photoresist materials by means of optical dispersion measurements

    Science.gov (United States)

    Taudt, Ch.; Baselt, T.; Koch, E.; Hartmann, P.

    2014-03-01

    The increase in efficiency and precision in the production of semiconductor structures under the use of polymeric materials like SU-8 is crucial in securing the technological innovation within this industry. The manufacturing of structures on wafers demands a high quality of materials, tools and production processes. In particular, deviations in the materials' parameters (e.g. cross-linking state, density or mechanical properties) could lead to subsequent problems such as a reduced lifetime of structures and systems. In particular problems during the soft and post-exposure bake process can lead to an inhomogeneous distribution of material properties. This paper describes a novel approach for the characterization of SU-8 material properties in relation to a second epoxy-based material of different cross-linking by the measurement of optical dispersion within the material. A white-light interferometer was used. In particular the setup consisted of a white-light source, a Michelson-type interferometer and a spectrometer. The investigation of the dispersion characteristics was carried out by the detection of the equalization wavelength for different positions of the reference arm in a range from 400 to 900 nm. The measured time delay due to dispersion ranges from 850 to 1050 ps/m. For evaluation purposes a 200μm SU-8 sample was characterized in the described setup regarding its dispersion characteristics in relation to bulk epoxy material. The novel measurement approach allowed a fast and high-resolution material characterization for SU-8 micro structures which was suitable for integration in production lines. The outlook takes modifications of the experimental setup regarding on-wafer measurements into account.

  7. Innovative SU-8 Lithography Techniques and Their Applications

    Directory of Open Access Journals (Sweden)

    Jeong Bong Lee

    2014-12-01

    Full Text Available SU-8 has been widely used in a variety of applications for creating structures in micro-scale as well as sub-micron scales for more than 15 years. One of the most common structures made of SU-8 is tall (up to millimeters high-aspect-ratio (up to 100:1 3D microstructure, which is far better than that made of any other photoresists. There has been a great deal of efforts in developing innovative unconventional lithography techniques to fully utilize the thick high aspect ratio nature of the SU-8 photoresist. Those unconventional lithography techniques include inclined ultraviolet (UV exposure, back-side UV exposure, drawing lithography, and moving-mask UV lithography. In addition, since SU-8 is a negative-tone photoresist, it has been a popular choice of material for multiple-photon interference lithography for the periodic structure in scales down to deep sub-microns such as photonic crystals. These innovative lithography techniques for SU-8 have led to a lot of unprecedented capabilities for creating unique micro- and nano-structures. This paper reviews such innovative lithography techniques developed in the past 15 years or so.

  8. SU-8 cantilever chip interconnection

    DEFF Research Database (Denmark)

    Johansson, Alicia Charlotte; Janting, Jakob; Schultz, Peter

    2006-01-01

    The polymer SU-8 is becoming widely used for all kinds of micromechanical and microfluidic devices, not only as a photoresist but also as the constitutional material of the devices. Many of these polymeric devices need to include a microfluidic system as well as electrical connection from the ele...

  9. Bi cluster-assembled interconnects produced using SU8 templates

    International Nuclear Information System (INIS)

    Partridge, J G; Matthewson, T; Brown, S A

    2007-01-01

    Bi clusters with an average diameter of 25 nm have been deposited from an inert gas aggregation source and assembled into thin-film interconnects which are formed between planar electrical contacts and supported on Si substrates passivated with Si 3 N 4 or thermally grown oxide. A layer of SU8 (a negative photoresist based on EPON SU-8 epoxy resin) is patterned using optical or electron-beam lithography, and it defines the position and dimensions of the cluster film. The conduction between the contacts is monitored throughout the deposition/assembly process, and subsequent I(V) characterization is performed in situ. Bi cluster-assembled interconnects have been fabricated with nanoscale widths and with up to 1:1 thickness:width aspect ratios. The conductivity of these interconnects has been increased, post-deposition, using a simple thermal annealing process

  10. Diffusion of water into SU-8 microcantilevers

    DEFF Research Database (Denmark)

    Liu, C.J.; Liu, Y.; Sokuler, M.

    2010-01-01

    We present a method to monitor the diffusion of liquid molecules in polymers. A microdrop of water is deposited by a piezoelectric drop generator onto the upper surface of a cantilever made of SU-8 based photoresist. In response, the cantilever bends in the opposite direction. We find...... sophisticated finite element model the diffusion coefficient of water in the SU-8 polymer can be determined quantitatively from the dynamics of cantilever bending....... that this bending is mainly caused by the diffusion of water into the cantilever and the consequent swelling of SU-8. Using a one-dimensional diffusion model and assuming a simple swelling law, we qualitatively model the bending of the cantilever during in and out diffusion of water in SU-8. With a more...

  11. In situ SU-8 silver nanocomposites

    Directory of Open Access Journals (Sweden)

    Søren V. Fischer

    2015-07-01

    Full Text Available Nanocomposite materials containing metal nanoparticles are of considerable interest in photonics and optoelectronics applications. However, device fabrication of such materials always encounters the challenge of incorporation of preformed nanoparticles into photoresist materials. As a solution to this problem, an easy new method of fabricating silver nanocomposites by an in situ reduction of precursors within the epoxy-based photoresist SU-8 has been developed. AgNO3 dissolved in acetonitrile and mixed with the epoxy-based photoresist SU-8 forms silver nanoparticles primarily during the pre- and post-exposure soft bake steps at 95 °C. A further high-temperature treatment at 300 °C resulted in the formation of densely homogeneously distributed silver nanoparticles in the photoresist matrix. No particle growth or agglomeration of nanoparticles is observed at this point. The reported new in situ silver nanocomposite materials can be spin coated as homogeneous thin films and structured by using UV lithography. A resolution of 5 µm is achieved in the lithographic process. The UV exposure time is found to be independent of the nanoparticle concentration. The fabricated silver nanocomposites exhibit high plasmonic responses suitable for the development of new optoelectronic and optical sensing devices.

  12. SU-8 Lenses: Simple Methods of Fabrication and Application in Optical Interconnection Between Fiber/LED and Microstructures

    Science.gov (United States)

    Nguyen, Minh-Hang; Nguyen, Hai-Binh; Nguyen, Tuan-Hung; Vu, Xuan-Manh; Lai, Jain-Ren; Tseng, Fan-Gang; Chen, Te-Chang; Lee, Ming-Chang

    2016-05-01

    This paper presents two facile methods to fabricate off-plane lenses made of SU-8, an epoxy-based negative photoresist from MicroChem, on glass for optical interconnection. The methods allow the fabrication of lenses with flexible spot size and focal length depending on SU-8 well size and SU-8 drop volume and viscosity. In the first method, SU-8 drops were applied directly into patterned SU-8 wells with Teflon-coated micropipettes, and were baked to become (a)-spherical lenses. The lens shape and size were mainly determined by SU-8 viscosity, ratio of drop volume to well volume, and baking temperature and time. In the second method, a glass substrate with SU-8 patterned wells was emerged in diluted SU-8, then drawn up and baked to form lenses. The lens shapes and sizes were mainly determined by SU-8 viscosity and well volume. By the two methods, SU-8 lenses were successfully fabricated with spot sizes varying in range from micrometers to hundred micrometers, and focal lengths varying in range of several millimeters, depending on the lens rim diameters and aspheric sag height. Besides, on-plane SU-8 lenses were fabricated by photolithography to work in conjunction with the off-plane SU-8 lenses. The cascaded lenses produced light spots reduced to several micrometers, and they can be applied as a coupler for light coupling from fiber/Light-emitting diode (LED) to microstructures and nanostructures. The results open up the path for fabricating novel optical microsystems for optical communication and optical sensing applications.

  13. Maskless Lithography Using Negative Photoresist Material: Impact of UV Laser Intensity on the Cured Line Width

    Science.gov (United States)

    Mohammed, Mohammed Ziauddin; Mourad, Abdel-Hamid I.; Khashan, Saud A.

    2018-06-01

    The application of maskless lithography technique on negative photoresist material is investigated in this study. The equipment used in this work is designed and built especially for maskless lithography applications. The UV laser of 405 nm wavelength with 0.85 Numerical Aperture is selected for direct laser writing. All the samples are prepared on a glass substrate. Samples are tested at different UV laser intensities and different stage velocities in order to study the impact on patterned line width. Three cases of spin coated layers of thickness 90 μm, 40 μm, and 28 μm on the substrate are studied. The experimental results show that line width has a generally increasing trend with intensity. However, a decreasing trend was observed for increasing velocity. The overall performance shows that the mr-DWL material is suitable for direct laser writing systems.

  14. Maskless Lithography Using Negative Photoresist Material: Impact of UV Laser Intensity on the Cured Line Width

    Science.gov (United States)

    Mohammed, Mohammed Ziauddin; Mourad, Abdel-Hamid I.; Khashan, Saud A.

    2018-04-01

    The application of maskless lithography technique on negative photoresist material is investigated in this study. The equipment used in this work is designed and built especially for maskless lithography applications. The UV laser of 405 nm wavelength with 0.85 Numerical Aperture is selected for direct laser writing. All the samples are prepared on a glass substrate. Samples are tested at different UV laser intensities and different stage velocities in order to study the impact on patterned line width. Three cases of spin coated layers of thickness 90 μm, 40 μm, and 28 μm on the substrate are studied. The experimental results show that line width has a generally increasing trend with intensity. However, a decreasing trend was observed for increasing velocity. The overall performance shows that the mr-DWL material is suitable for direct laser writing systems.

  15. High temperature SU-8 pyrolysis for fabrication of carbon electrodes

    DEFF Research Database (Denmark)

    Hassan, Yasmin Mohamed; Caviglia, Claudia; Hemanth, Suhith

    2017-01-01

    In this work, we present the investigation of the pyrolysis parameters at high temperature (1100 °C) for the fabrication of two-dimensional pyrolytic carbon electrodes. The electrodes were fabricated by pyrolysis of lithographically patterned negative epoxy based photoresist SU-8. A central...... composite experimental design was used to identify the influence of dwell time at the highest pyrolysis temperature and heating rate on electrical, electrochemical and structural properties of the pyrolytic carbon: Van der Pauw sheet resistance measurements, cyclic voltammetry, electrochemical impedance...... spectroscopy and Raman spectroscopy were used to characterize the pyrolytic carbon. The results show that the temperature increase from 900 °C to 1100 °C improves the electrical and electrochemical properties. At 1100 °C, longer dwell time leads to lower resistivity, while the variation of the pyrolysis...

  16. Alkali-developable silicone-based negative photoresist (SNP) for deep UV, electron beam, and X-ray lithographies

    International Nuclear Information System (INIS)

    Ban, Hiroshi; Tanaka, Akinobu; Kawai, Yoshio; Deguchi, Kimiyoshi

    1989-01-01

    A new silicone-based negative photoresist (SNP) developable with alkaline aqueous solutions is prepared. SNP composed of acetylated phenylsilsesquioxane oligomer and azidopyrene is applied to deep UV, electron beam (EB), and X-ray lithographies. SNP slightly swells in alkaline developers, thus exhibiting exceptionally high resolution characteristics for a negative resist. The resistance of SNP to oxygen reactive ion etching is approximately 30 times greater than that of conventional novolac resists. (author)

  17. Functionalized SU-8 patterned with X-ray Lithography

    DEFF Research Database (Denmark)

    Balslev, Søren; Romanato, F.

    2005-01-01

    spontaneous emission light source that couples out light normal to the chip plane. In addition we examine the influence of the x-ray irradiation on the fluorescence of thin films of dye doped SU-8. The dye embedded in the SU-8 is optically excited during, characterization by an external light source tuned......In this work we demonstrate the feasibility of x-ray lithography on SU-8 photoresist doped with the laser dye Rhodamine 6G, while retaining the photoactive properties of the embedded dye. Two kinds of structures are fabricated via soft x-ray lithography and characterized: a laser and in amplified...

  18. Large-core single-mode rib SU8 waveguide using solvent-assisted microcontact molding.

    Science.gov (United States)

    Huang, Cheng-Sheng; Wang, Wei-Chih

    2008-09-01

    This paper describes a novel fabrication technique for constructing a polymer-based large-core single-mode rib waveguide. A negative tone SU8 photoresist with a high optical transmission over a large wavelength range and stable mechanical properties was used as a waveguide material. A waveguide was constructed by using a polydimethylsiloxane stamp combined with a solvent-assisted microcontact molding technique. The effects on the final pattern's geometry of four different process conditions were investigated. Optical simulations were performed using beam propagation method software. Single-mode beam propagation was observed at the output of the simulated waveguide as well as the actual waveguide through the microscope image.

  19. A facile micropatterning method for a highly flexible PEDOT:PSS on SU-8

    KAUST Repository

    Cho, Nam Chul; Diekhans, Justin; Steward, Malia; Bakr, Osman; Choi, Seungkeun

    2016-01-01

    We report the micropatterning of conducting polymer on the epoxy-based photoresist to demonstrate fully organic, conducting and flexible electrodes. We show that polystyrene sulfonic acid can be covalently linked to the surface of the photoresist (SU-8) by forming sulfonyl ester at the interfaces. We also present an application of the patterned PEDOT:PSS (poly(3,4-ethylenedioxythiophene) polystyrene sulfonate)/SU-8 to the electroplating of metal electrodes. © 2016 Elsevier B.V.

  20. A facile micropatterning method for a highly flexible PEDOT:PSS on SU-8

    KAUST Repository

    Cho, Nam Chul

    2016-04-17

    We report the micropatterning of conducting polymer on the epoxy-based photoresist to demonstrate fully organic, conducting and flexible electrodes. We show that polystyrene sulfonic acid can be covalently linked to the surface of the photoresist (SU-8) by forming sulfonyl ester at the interfaces. We also present an application of the patterned PEDOT:PSS (poly(3,4-ethylenedioxythiophene) polystyrene sulfonate)/SU-8 to the electroplating of metal electrodes. © 2016 Elsevier B.V.

  1. Surface chemical functionalisation of epoxy photoresist-based microcantilevers with organic-coated TiO2 nanocrystals

    DEFF Research Database (Denmark)

    Ingrosso, C.; Sardella, E.; Keller, S. S.

    2012-01-01

    In this Letter, a solution-based approach has been used for chemically immobilising oleic acid (OLEA)-capped TiO2 nanocrystals (NCs) on the surface of microcantilevers formed of SU-8, a negative tone epoxy photoresist. The immobilisation has been carried out at room temperature, under visible lig...

  2. Optimized plasma-deposited fluorocarbon coating for dry release and passivation of thin SU-8 cantilevers

    DEFF Research Database (Denmark)

    Keller, Stephan Urs; Häfliger, Daniel; Boisen, Anja

    2008-01-01

    during fluorocarbon deposition, the surface free energy of the coating can be tuned to allow for uniform wetting during spin coating of arbitrary thin SU-8 films. Further, they define an optimal pressure regime for the release of thin polymer structures at high yield. They demonstrate the successful......Plasma-deposited fluorocarbon coatings are introduced as a convenient method for the dry release of polymer structures. In this method, the passivation process in a deep reactive ion etch reactor was used to deposit hydrophobic fluorocarbon films. Standard photolithography with the negative epoxy......-based photoresist SU-8 was used to fabricate polymer structures such as cantilevers and membranes on top of the nonadhesive release layer. The authors identify the plasma density as the main parameter determining the surface properties of the deposited fluorocarbon films. They show that by modifying the pressure...

  3. SU-8 photoresist-derived electrospun carbon nanofibres as high ...

    Indian Academy of Sciences (India)

    2017-06-09

    Jun 9, 2017 ... as high-capacity anode material for lithium ion battery. M KAKUNURI, S KAUSHIK, A SAINI and C S SHARMA. ∗. Creative and Advanced Research Based On Nanomaterials (CARBON) Laboratory, Department of Chemical Engineering,. Indian Institute of Technology, Hyderabad, Kandi 502285, India. ∗.

  4. Use of SU8 as a stable and biocompatible adhesion layer for gold bioelectrodes.

    Science.gov (United States)

    Matarèse, Bruno F E; Feyen, Paul L C; Falco, Aniello; Benfenati, Fabio; Lugli, Paolo; deMello, John C

    2018-04-03

    Gold is the most widely used electrode material for bioelectronic applications due to its high electrical conductivity, good chemical stability and proven biocompatibility. However, it adheres only weakly to widely used substrate materials such as glass and silicon oxide, typically requiring the use of a thin layer of chromium between the substrate and the metal to achieve adequate adhesion. Unfortunately, this approach can reduce biocompatibility relative to pure gold films due to the risk of the underlying layer of chromium becoming exposed. Here we report on an alternative adhesion layer for gold and other metals formed from a thin layer of the negative-tone photoresist SU-8, which we find to be significantly less cytotoxic than chromium, being broadly comparable to bare glass in terms of its biocompatibility. Various treatment protocols for SU-8 were investigated, with a view to attaining high transparency and good mechanical and biochemical stability. Thermal annealing to induce partial cross-linking of the SU-8 film prior to gold deposition, with further annealing after deposition to complete cross-linking, was found to yield the best electrode properties. The optimized glass/SU8-Au electrodes were highly transparent, resilient to delamination, stable in biological culture medium, and exhibited similar biocompatibility to glass.

  5. Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography

    Directory of Open Access Journals (Sweden)

    Harutaka Mekaru

    2015-02-01

    Full Text Available In combination with tapered-trench-etching of Si and SU-8 photoresist, a grayscale mask for deep X-ray lithography was fabricated and passed a 10-times-exposure test. The performance of the X-ray grayscale mask was evaluated using the TERAS synchrotron radiation facility at the National Institute of Advanced Industrial Science and Technology (AIST. Although the SU-8 before photo-curing has been evaluated as a negative-tone photoresist for ultraviolet (UV and X-ray lithographies, the characteristic of the SU-8 after photo-curing has not been investigated. A polymethyl methacrylate (PMMA sheet was irradiated by a synchrotron radiation through an X-ray mask, and relationships between the dose energy and exposure depth, and between the dose energy and dimensional transition, were investigated. Using such a technique, the shape of a 26-μm-high Si absorber was transformed into the shape of a PMMA microneedle with a height of 76 μm, and done with a high contrast. Although during the fabrication process of the X-ray mask a 100-μm-pattern-pitch (by design was enlarged to 120 μm. However, with an increase in an integrated dose energy this number decreased to 99 μm. These results show that the X-ray grayscale mask has many practical applications. In this paper, the author reports on the evaluation results of SU-8 when used as a membrane material for an X-ray mask.

  6. Immunosensing by luminescence reduction in surface-modified microstructured SU-8

    Energy Technology Data Exchange (ETDEWEB)

    Eravuchira, Pinkie Jacob; Baranowska, Malgorzata; Eckstein, Chris [Departament d’Enginyeria Electrònica, Elèctrica i Automàtica, Universitat Rovira i Virgili, Avda. Països Catalans 26, Tarragona 43007 (Spain); Díaz, Francesc [Departament de Química Física i Inorgànica, Universitat Rovira i Virgili, Marcelí Domingo s/n, Tarragona 43007 (Spain); Llobet, Eduard; Marsal, Lluis F. [Departament d’Enginyeria Electrònica, Elèctrica i Automàtica, Universitat Rovira i Virgili, Avda. Països Catalans 26, Tarragona 43007 (Spain); Ferré-Borrull, Josep, E-mail: josep.ferre@urv.cat [Departament d’Enginyeria Electrònica, Elèctrica i Automàtica, Universitat Rovira i Virgili, Avda. Països Catalans 26, Tarragona 43007 (Spain)

    2017-01-15

    Highlights: • The reduction of photoluminescence of SU-8 upon surface modification is reported. • Micropillar structuring of SU-8 surface results in an increased photoluminescence reduction rate (10% glass, 15% silicon). • Photoluminescence reduction rate can be a transduction parameter for the detection of antibody-antigen binding events. • The proposed sensing mechanism can be used to quantify small concentrations of antibody. • Lower limit of detection (LOD) of 28 μg/ml on silicon substrates and 42 μg/ml on glass substrates was achieved. - Abstract: SU-8, an epoxy based negative photoresist is extensively used as a structural material for the fabrication of microelectro-mechanical systems and in microelectronics technology. However, the possible applications of SU-8 for biosensing have not been explored much, mainly because of the photoluminescence SU-8 possesses in the near-UV and visible wavelength ranges which hinders fluorescent labelling of biorecognition events. In this study we demonstrate that photoluminescence of SU-8 can be employed itself as a sensing transduction parameter to produce a tool for immunosensing: the photoluminescence shows a systematic reduction upon modification of its surface chemistry, and in particular upon attachment of an antigen-antibody (aIgG-IgG) pair. We investigate the relation of the amount of reduction of photoluminescence on planar and microstructured surfaces, and we show that microstructuring leads to a higher reduction than a planar surface. Furthermore, we evaluated the dependence of photoluminescence reduction as a function of analyte concentration to prove that this magnitude can be applied to immunosensing.

  7. Fabrication of raised and inverted SU8 polymer waveguides

    Science.gov (United States)

    Holland, Anthony S.; Mitchell, Arnan; Balkunje, Vishal S.; Austin, Mike W.; Raghunathan, Mukund K.

    2005-01-01

    Polymer films with high optical transmission have been investigated for making optical devices for several years. SU8 photoresist and optical adhesives have been investigated for use as thin films for optical devices, not what they were originally designed for. Optical adhesives are typically a one component thermoset polymer and are convenient to use for making thin film optical devices such as waveguides. They are prepared in minutes as thin films unlike SU8, which has to be carefully thermally cured over several hours for optimum results. However SU8 can be accurately patterned to form the geometry of structures required for single mode optical waveguides. SU8 in combination with the lower refractive index optical adhesive films such as UV15 from Master Bond are used to form single and multi mode waveguides. SU8 is photopatternable but we have also used dry etching of the SU8 layer or the other polymer layers e.g. UV15 to form the ribs, ridges or trenches required to guide single modes of light. Optical waveguides were also fabricated using only optical adhesives of different refractive indices. The resolution obtainable is poorer than with SU8 and hence multi mode waveguides are obtained. Loss measurements have been obtained for waveguides of different geometries and material combinations. The process for making polymer waveguides is demonstrated for making large multi mode waveguides and microfluidic channels by scaling the process up in size.

  8. Effects of design geometry on SU8 polymer waveguides

    Science.gov (United States)

    Holland, Anthony S.; Balkunje, Vishal S.; Mitchell, Arnan; Austin, Michael W.; Raghunathan, Mukund K.; Kostovski, Gorgi

    2005-02-01

    The spin-on photoresist SU8 from MicroChem has a relatively high refractive index (n=1.57 at 1550nm) compared with other polymers. It is stable and has high optical transmission at optical communication wavelengths. In this paper we study rib waveguides fabricated using SU8 as the core layer and thermoset polymers UV15 (n=1.50 at 1550nm) from Master Bond and NOA61 (n=1.54 at 1550nm) from Gentec as the cladding layers. The rib height is varied from 0.3 to 1.7μm high. This is part of the SU8 layer sandwiched between the cladding layers. The waveguides are tested to determine the effects of varying this geometry for single mode optical transmission. The lengths of the waveguides were 1.5 cm to 5 cm.

  9. SU-8 micropatterning for microfluidic droplet and microparticle focusing

    International Nuclear Information System (INIS)

    Debuisson, Damien; Senez, Vincent; Arscott, Steve

    2011-01-01

    We demonstrate micropatterned surfaces consisting of concentric circles and spirals which can focus an evaporating sessile droplet to a specific location on a surface. We also study the micropattern geometry to focus microparticles contained within the droplet. The micropatterned surfaces are fabricated using the photoresist SU-8. Our process enables the modification of the surface wetting via the formation of smooth trench-like defects in the SU-8 which define the micropatterns; the geometry of these micropatterns determines the droplet/microparticle focusing. It is clearly shown that the introduction of small gaps into the micropatterns promotes microparticle centring due to the modification of the depinning angle of the droplet. We also show that the use of spiral micropatterns promotes microparticle centring. Finally, microparticle focusing can be enhanced by modification of surface wetting via the addition of a thin fluorocarbon hydrophobic layer onto the SU-8

  10. A Simple Hydrophilic Treatment of SU-8 Surfaces for Cell Culturing and Cell Patterning

    DEFF Research Database (Denmark)

    Wang, Zhenyu; Stangegaard, Michael; Dufva, Hans Martin

    2005-01-01

    SU-8, an epoxy-based photoresist, widely used in constitution different mTAS systems, is incompatible with mammalian cell adhesion and culture in its native form. Here, we demonstrate a simple, cheap and robust two-step method to render a SU-8 surface hydrophilic and compatible with cell culture........ The contact angle of SU-8 surface was significantly reduced from 90° to 25° after the surface modification. The treated SU-8 surfaces provided a cell culture environment that was comparable with cell culture flask surface in terms of generation time and morphology....

  11. SU-8 doped and encapsulated n-type graphene nanomesh with high air stability

    Energy Technology Data Exchange (ETDEWEB)

    Al-Mumen, Haider [Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824 (United States); Department of Electrical Engineering, University of Babylon, Babylon (Iraq); Dong, Lixin; Li, Wen, E-mail: wenli@egr.msu.edu [Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824 (United States)

    2013-12-02

    N-type doping of graphene with long-term chemical stability in air represents a significant challenge for practical application of graphene electronics. This paper reports a reversible doping method to achieve highly stable n-type graphene nanomeshes, in which the SU-8 photoresist simultaneously serves as an effective electron dopant and an excellent encapsulating layer. The chemically stable n-type characteristics of the SU-8 doped graphene were evaluated in air using their Raman spectra, electrical transport properties, and electronic band structures. The SU-8 doping does minimum damage to the hexagonal carbon lattice of graphene and is completely reversible by removing the uncrosslinked SU-8 resist.

  12. Chemical synthesis on SU-8

    DEFF Research Database (Denmark)

    Qvortrup, Katrine; Taveras, Kennedy; Thastrup, Ole

    2011-01-01

    In this paper we describe a highly effective surface modification of SU-8 microparticles, the attachment of appropriate linkers for solid-supported synthesis, and the successful chemical modification of these particles via controlled multi-step organic synthesis leading to molecules attached...

  13. Effects of post exposure bake temperature and exposure time on SU-8 nanopattern obtained by electron beam lithography

    Science.gov (United States)

    Yasui, Manabu; Kazawa, Elito; Kaneko, Satoru; Takahashi, Ryo; Kurouchi, Masahito; Ozawa, Takeshi; Arai, Masahiro

    2014-11-01

    SU-8 is a photoresist imaged using UV rays. However, we investigated the characteristics of an SU-8 nanopattern obtained by electron beam lithography (EBL). In particular, we studied the relationship between post-exposure bake (PEB) temperature and exposure time on an SU-8 nanopattern with a focus on phase transition temperature. SU-8 residue was formed by increasing both PEB temperature and exposure time. To prevent the formation of this, Monte Carlo simulation was performed; the results of such simulation showed that decreasing the thickness of SU-8 can reduce the amount of residue from the SU-8 nanopattern. We confirmed that decreasing the thickness of SU-8 can also prevent the formation of residue from the SU-8 nanopattern with EBL.

  14. SU-8 Guiding Layer for Love Wave Devices

    Directory of Open Access Journals (Sweden)

    Michael I. Newton

    2007-11-01

    Full Text Available SU-8 is a technologically important photoresist used extensively for thefabrication of microfluidics and MEMS, allowing high aspect ratio structures to beproduced. In this work we report the use of SU-8 as a Love wave sensor guiding layerwhich allows the possibility of integrating a guiding layer with flow cell during fabrication.Devices were fabricated on ST-cut quartz substrates with a single-single finger design suchthat a surface skimming bulk wave (SSBW at 97.4 MHz was excited. SU-8 polymer layerswere successively built up by spin coating and spectra recorded at each stage; showing afrequency decrease with increasing guiding layer thickness. The insertion loss andfrequency dependence as a function of guiding layer thickness was investigated over thefirst Love wave mode. Mass loading sensitivity of the resultant Love wave devices wasinvestigated by deposition of multiple gold layers. Liquid sensing using these devices wasalso demonstrated; water-glycerol mixtures were used to demonstrate sensing of density-viscosity and the physical adsorption and removal of protein was also assessed usingalbumin and fibrinogen as model proteins.

  15. Micromechanical testing of SU-8 cantilevers

    OpenAIRE

    Hopcroft, M; Kramer, T; Kim, G; Takashima, K; Higo, Y; Moore, D; Brugger, J

    2005-01-01

    SU-8 is a photoplastic polymer with a wide range of possible applications in microtechnology. Cantilevers designed for atomic force microscopes were fabricated in SU-8. The mechanical properties of these cantilevers were investigated using two microscale testing techniques: contact surface profilometer beam deflection and static load deflection at a point on the beam using a specially designed test machine. The SU-8 Young's modulus value from the microscale test methods is approximately 2-3 GPa.

  16. SU-8 Based Piezoresistive Mechanical Sensor

    DEFF Research Database (Denmark)

    Thaysen, Jacob; Yalcinkaya, Arda Deniz; Vestergaard, R.K.

    2002-01-01

    We present the first SU-8 based piezoresistive mechanical sensor. Conventionally, silicon has been used as a piezoresistive material due to its high gauge factor and thereby high sensitivity to strain changes in a sensor. By using the fact that SU-8 is much softer than silicon and that a gold...

  17. In situ SU-8 silver nanocomposites

    DEFF Research Database (Denmark)

    Fischer, Søren Vang; Uthuppu, Basil; Jakobsen, Mogens Havsteen

    2015-01-01

    Nanocomposite materials containing metal nanoparticles are of considerable interest in photonics and optoelectronics applications. However, device fabrication of such materials always encounters the challenge of incorporation of preformed nanoparticles into photoresist materials. As a solution to...

  18. PMMA to SU-8 bonding for polymer based lab-on-a-chip systems with integrated optics

    DEFF Research Database (Denmark)

    Olsen, Brian Bilenberg; Nielsen, Theodor; Clausen, Bjarne Hans

    2004-01-01

    We present an adhesive bonding technique developed for SU-8 based "lab-on-a-chip"- systems with integrated optical components. Microfluidic channels and optical components (e.g. wave-guides) are defined in SU-8 photoresist on a Pyrex glass substrate. The microfluidic channels are sealed by a second...... Pyrex substrate, bonded on top of the cross-linked SU-8 structure using an inter- mediate layer of 950K molecular weight poly-methylmethacrylate (PMMA). Due to a lower refractive index of PMMA, this bonding technique offers optical waveguiding in the SU-8 structures in combination with good sealing...... of the microfluidic channels. The bonding technique is investigated with respect to bonding temperature in the range of 50 - 150 degr. C and at bonding forces of 1000 N and 2000 N on a 4-inch wafer. A maximum bonding strength of 16 MPa is achieved for the PMMA to SU-8 bonding at a bonding temperature of 110 degr. C...

  19. A high aspect ratio SU-8 fabrication technique for hollow microneedles for transdermal drug delivery and blood extraction

    Science.gov (United States)

    Chaudhri, Buddhadev Paul; Ceyssens, Frederik; De Moor, Piet; Van Hoof, Chris; Puers, Robert

    2010-06-01

    Protein drugs, e.g. hormonal drugs, cannot be delivered orally to a patient as they get digested in the gastro-intestinal (GI) tract. Thus, it is imperative that these kinds of drugs are delivered transdermally through the skin. To provide for real-time feedback as well as to test independently for various substances in the blood, we also need a blood sampling system. Microneedles can perform both these functions. Further, microneedles made of silicon or metal have the risk of breaking inside the skin thereby leading to complications. SU-8, being approved of as being biocompatible by the Food and Drug Agency (FDA) of the United States, is an attractive alternative because firstly it is a polymer material, thereby reducing the chances of breakages inside the skin, and secondly it is a negative photoresist, thereby leading to ease of fabrication. Thus, here we present very tall (around 1600 µm) SU-8 polymer-based hollow microneedles fabricated by a simple and repeatable process, which are a very good candidate for transdermal drug delivery as well as blood extraction. The paper elaborates on the details that allow the fabrication of such extreme aspect ratios (>100).

  20. A high aspect ratio SU-8 fabrication technique for hollow microneedles for transdermal drug delivery and blood extraction

    International Nuclear Information System (INIS)

    Chaudhri, Buddhadev Paul; Ceyssens, Frederik; Van Hoof, Chris; Puers, Robert; De Moor, Piet

    2010-01-01

    Protein drugs, e.g. hormonal drugs, cannot be delivered orally to a patient as they get digested in the gastro-intestinal (GI) tract. Thus, it is imperative that these kinds of drugs are delivered transdermally through the skin. To provide for real-time feedback as well as to test independently for various substances in the blood, we also need a blood sampling system. Microneedles can perform both these functions. Further, microneedles made of silicon or metal have the risk of breaking inside the skin thereby leading to complications. SU-8, being approved of as being biocompatible by the Food and Drug Agency (FDA) of the United States, is an attractive alternative because firstly it is a polymer material, thereby reducing the chances of breakages inside the skin, and secondly it is a negative photoresist, thereby leading to ease of fabrication. Thus, here we present very tall (around 1600 µm) SU-8 polymer-based hollow microneedles fabricated by a simple and repeatable process, which are a very good candidate for transdermal drug delivery as well as blood extraction. The paper elaborates on the details that allow the fabrication of such extreme aspect ratios (>100).

  1. Processing of thin SU-8 films

    International Nuclear Information System (INIS)

    Keller, Stephan; Blagoi, Gabriela; Lillemose, Michael; Haefliger, Daniel; Boisen, Anja

    2008-01-01

    This paper summarizes the results of the process optimization for SU-8 films with thicknesses ≤5 µm. The influence of soft-bake conditions, exposure dose and post-exposure-bake parameters on residual film stress, structural stability and lithographic resolution was investigated. Conventionally, the SU-8 is soft-baked after spin coating to remove the solvent. After the exposure, a post-exposure bake at a high temperature T PEB ≥ 90 °C is required to cross-link the resist. However, for thin SU-8 films this often results in cracking or delamination due to residual film stress. The approach of the process optimization is to keep a considerable amount of the solvent in the SU-8 before exposure to facilitate photo-acid diffusion and to increase the mobility of the monomers. The experiments demonstrate that a replacement of the soft-bake by a short solvent evaporation time at ambient temperature allows cross-linking of the thin SU-8 films even at a low T PEB = 50 °C. Fourier-transform infrared spectroscopy is used to confirm the increased cross-linking density. The low thermal stress due to the reduced T PEB and the improved structural stability result in crack-free structures and solve the issue of delamination. The knowledge of the influence of different processing parameters on the responses allows the design of optimized processes for thin SU-8 films depending on the specific application

  2. Silicon/SU8 multi-electrode micro-needle for in vivo neurochemical monitoring.

    Science.gov (United States)

    Vasylieva, Natalia; Marinesco, Stéphane; Barbier, Daniel; Sabac, Andrei

    2015-10-15

    Simultaneous monitoring of glucose and lactate is an important challenge for understanding brain energetics in physiological or pathological states. We demonstrate here a versatile method based on a minimally invasive single implantation in the rat brain. A silicon/SU8-polymer multi-sensing needle-shaped biosensor, was fabricated and tested. The multi-electrode array design comprises three platinum planar microelectrodes with a surface area of 40 × 200 µm(2) and a spacing of 200 µm, which were micromachined on a single 3mm long micro-needle having a 100 × 50 µm(2) cross-section for reduced tissue damage during implantation. Platinum micro-electrodes were aligned at the bottom of micro-wells obtained by photolithography on a SU8 photoresist layer. After clean room processing, each micro-electrode was functionalized inside the micro-wells by means of a micro-dispensing device, either with glucose oxidase or with lactate oxidase, which were cross-linked on the platinum electrodes. The third electrode covered with Bovine Serum Albumin (BSA) was used for the control of non-specific currents. The thick SU8 photoresist layer has revealed excellent electrical insulation of the micro-electrodes and between interconnection lines, and ensured a precise localization and packaging of the sensing enzymes on platinum micro-electrodes. During in vitro calibration with concentrations of analytes in the mM range, the micro-wells patterned in the SU8 photoresist proved to be highly effective in eliminating cross-talk signals, caused by H2O2 diffusion from closely spaced micro-electrodes. Moreover, our biosensor was successfully assayed in the rat cortex for simultaneous monitoring of both glucose and lactate during insulin and glucose administration. Copyright © 2015 Elsevier B.V. All rights reserved.

  3. On SU(8)sub(L)xSU(8)sub(R) grand unified model

    International Nuclear Information System (INIS)

    Pirogov, Yu.F.

    1981-01-01

    A set of general propositions is considered which ground the choice of the SU(8)sub(L)xSU(8)sub(R) group as a unified symmetry group. According to these propositions the group SU(8)sub(L)xSU(8)sub(R) is the most natural unified group, it is the maximal symmetry group of the kinetic term of the lagrangian single family which conserves the fermion number. A new principle is introduced. According to this principle, the mirror doubling of the fermion spectrum, necessary for renormalizability of the given unified model is, on the other hand, a manifestation of the extended conformal invariance at short distances [ru

  4. SU-8 micro Coriolis mass flow sensor

    NARCIS (Netherlands)

    Monge, Rosa; Groenesteijn, Jarno; Alveringh, Dennis; Wiegerink, Remco J.; Lötters, Joost Conrad; Fernandez, Luis J.

    2017-01-01

    Abstract This work presents the modelling, design, fabrication and test of the first micro Coriolis mass flow sensor fully fabricated in SU-8 by photolithography processes. The sensor consists of a channel with rectangular cross-section with inner opening of 100 μm × 100 μm and is actuated at

  5. MWP phase shifters integrated in PbS-SU8 waveguides.

    Science.gov (United States)

    Hervás, Javier; Suárez, Isaac; Pérez, Joaquín; Cantó, Pedro J Rodríguez; Abargues, Rafael; Martínez-Pastor, Juan P; Sales, Salvador; Capmany, José

    2015-06-01

    We present new kind of microwave phase shifters (MPS) based on dispersion of PbS colloidal quantum dots (QDs) in commercially available photoresist SU8 after a ligand exchange process. Ridge PbS-SU8 waveguides are implemented by integration of the nanocomposite in a silicon platform. When these waveguides are pumped at wavelengths below the band-gap of the PbS QDs, a phase shift in an optically conveyed (at 1550 nm) microwave signal is produced. The strong light confinement produced in the ridge waveguides allows an improvement of the phase shift as compared to the case of planar structures. Moreover, a novel ridge bilayer waveguide composed by a PbS-SU8 nanocomposite and a SU8 passive layer is proposed to decrease the propagation losses of the pump beam and in consequence to improve the microwave phase shift up to 36.5° at 25 GHz. Experimental results are reproduced by a theoretical model based on the slow light effect produced in a semiconductor waveguide due to the coherent population oscillations. The resulting device shows potential benefits respect to the current MPS technologies since it allows a fast tunability of the phase shift and a high level of integration due to its small size.

  6. Comparison of different photoresist buffer layers in SPR sensors based on D-shaped POF and gold film

    Science.gov (United States)

    Cennamo, Nunzio; Pesavento, Maria; De Maria, Letizia; Galatus, Ramona; Mattiello, Francesco; Zeni, Luigi

    2017-04-01

    A comparative analysis of two optical fiber sensing platforms is presented. The sensors are based on surface plasmon resonance (SPR) in a D-shaped plastic optical fiber (POF) with a photoresist buffer layer between the exposed POF core and the thin gold film. We show how the sensor's performances change when the photoresist layer changes. The photoresist layers proposed in this analysis are SU-8 3005 and S1813. The experimental results are congruent with the numerical studies and it is instrumental for chemical and bio-chemical applications. Usually, the photoresist layer is required in order to increase the performance of the SPR-POF sensor.

  7. Invisible Security Printing on Photoresist Polymer Readable by Terahertz Spectroscopy

    Directory of Open Access Journals (Sweden)

    Hee Jun Shin

    2017-12-01

    Full Text Available We experimentally modulate the refractive index and the absorption coefficient of an SU-8 dry film in the terahertz region by UV light (362 nm exposure with time dependency. Consequently, the refractive index of SU-8 film is increased by approximately 6% after UV light exposure. Moreover, the absorption coefficient also changes significantly. Using the reflective terahertz imaging technique, in addition, we can read security information printed by UV treatment on an SU-8 film that is transparent in the visible spectrum. From these results, we successfully demonstrate security printing and reading by using photoresist materials and the terahertz technique. This investigation would provide a new insight into anti-counterfeiting applications in fields that need security.

  8. Direct injection in organic SU8 nanowires and nanotubes for waveguiding properties investigation

    Science.gov (United States)

    Bigeon, J.; Huby, N.; Duvail, Jean-Luc; Bêche, Bruno

    2014-05-01

    We report photonic concepts related to injection and sub-wavelength propagation in nanofibers (nanowires and nanotubes). These nanostructures are fabricated by the wetting template method leading to aspect ratio of over 250. At first, injection into nanowires and nanotubes of SU8, a photoresist used for integrated photonics, was successfully achieved by using polymer microlensed fibers with sub-micronic radius of curvature. Theoret- ical simulation by finite domain time-dependent (FDTD) method was used to determine the sub-wavelength propagation for nanowires and nanotubes and corroborate this coupling phenomena. The original confinement of energy density into SU8 nanotubes is highlighted. Finally, characterisation of propagation losses is reported by using a cut-back method transposed to such nanotubes and determined to range between 1 and 2 dB/mm. Both injection and cut-back method developed here are compatible with any sub-micronic structures. This work on SU8 nanofibers suggests broader perspectives for future nanophotonics.

  9. On grand unified SU(8)sub(L) x SU(8)sub(R) model

    International Nuclear Information System (INIS)

    Pirogov, Yu.F.

    1980-01-01

    In the model of early chiral grand unification SU(8)sub(L)xSU(8)sub(R) with intermediate symmetry hierarchies the radiation corrections for sinsup(2)thetasub(W)(μ) and α(μ) are calculated and unification mass M 8 is found in the one loop approximation with Higgs fields contribution being neglected. It is shown that there exists a natural hierarchy, leading to the decrease of sinsup(2)thetasub(W)(Msub(W)) down to the value sinsup(2)thetasub(W)=1/5-1/4 and simultaneous decrease of M 8 down to M 8 =(10 6 -10 7 ) GeV as compared with the values when there is no hierarchy [ru

  10. A novel and simple fabrication method of embedded SU-8 micro channels by direct UV lithography

    International Nuclear Information System (INIS)

    Fu, C; Hung, C; Huang, H

    2006-01-01

    In this paper, we presents a novel and simple method to fabricate embedded micro channels. The method based on different light absorption properties of the SU-8 thick photoresist under different incident UV wavelengths. The channel structures are defined by the ordinary I-line, while the cover layer is patterned by the deep UV. Because the deep UV is obtained directly on the same aligner with a set of filter mirrors, the embedded channel can be easily produced without other rare facilities. Besides, the relationship between the thickness of the top layer and the exposure dose of the deep UV has been measured by an ingeniously designed experiment. The specific thickness of the top layer of the embedded micro channel can then be secured by the specific deep-UV exposure dose. Further more, many meaningful mechanical structures have been realized by this method, the material property of the top layer are also measured

  11. Broken SU(8) symmetry and the new particles

    International Nuclear Information System (INIS)

    Kramer, G.; Schiller, D.H.

    1976-05-01

    We study the mass spectra and wave functions for vector and pseudoscalar mesons in broken SU(8) (SU(8) is contained in SU(4)F * SU(2)J), where F stands for flavour and J for usual spin. The connection with the standard mass breaking in SU(4)F is worked out. We find that even in the presence of strong SU(8) breaking the ideal mixing scheme for the vector mesons can be approximately retained. For the pseudoscalar mesons the mixing of the singlet with the 63-plet representation of SU(8) turns out to be essential and stongly nonideal. (orig.) [de

  12. Suspended microstructures of epoxy based photoresists fabricated with UV photolithography

    DEFF Research Database (Denmark)

    Hemanth, Suhith; Anhøj, Thomas Aarøe; Caviglia, Claudia

    2017-01-01

    In this work we present an easy, fast, reliable and low cost microfabrication technique for fabricating suspended microstructures of epoxy based photoresistswith UV photolithography. Two different fabrication processes with epoxy based resins (SU-8 and mr-DWL) using UV exposures at wavelengths...... of 313 nm and 405 nm were optimized and compared in terms of structural stability, control of suspended layer thickness and resolution limits. A novel fabrication process combining the two photoresists SU-8 and mr-DWL with two UV exposures at 365 nm and 405 nm respectively provided a wider processing...... window for definition of well-defined suspended microstructures with lateral dimensions down to 5 μmwhen compared to 313 nm or 365 nm UV photolithography processes....

  13. Photochemical modification and patterning of SU-8 using Anthraquinone photolinkers

    DEFF Research Database (Denmark)

    Blagoi, Gabriela; Keller, Stephan Urs; Persson, Karl Fredrik

    2008-01-01

    -dimensional patterns on a Novolac A derivative polymer (SU-8) and, subsequently, their functionalization with biomolecules. Anthraquinone (AQ) derivatives are used to chemically modify and pattern SU-8 surfaces. Features as small as 20 μm are obtained when using uncollimated light. The X−Y spatial resolution...

  14. Injection and waveguiding properties in SU8 nanotubes for sub-wavelength regime propagation and nanophotonics integration

    Science.gov (United States)

    Bigeon, John; Huby, Nolwenn; Duvail, Jean-Luc; Bêche, Bruno

    2014-04-01

    We report photonic concepts related to injection and sub-wavelength propagation in nanotubes, an unusual but promising geometry for highly integrated photonic devices. Theoretical simulation by the finite domain time-dependent (FDTD) method was first used to determine the features of the direct light injection and sub-wavelength propagation regime within nanotubes. Then, the injection into nanotubes of SU8, a photoresist used for integrated photonics, was successfully achieved by using polymer microlensed fibers with a sub-micronic radius of curvature, as theoretically expected from FDTD simulations. The propagation losses in a single SU8 nanotube were determined by using a comprehensive set-up and a protocol for optical characterization. The attenuation coefficient has been evaluated at 1.25 dB mm-1 by a cut-back method transposed to such nanostructures. The mechanisms responsible for losses in nanotubes were identified with FDTD theoretical support. Both injection and cut-back methods developed here are compatible with any sub-micronic structures. This work on SU8 nanotubes suggests broader perspectives for future nanophotonics.

  15. Uniform fabrication of thick SU-8 patterns on small-sized wafers for micro-optics applications

    Science.gov (United States)

    Abada, S.; Reig, B.; Daran, E.; Doucet, JB; Camps, T.; Charlot, S.; Bardinal, V.

    2014-05-01

    This paper reports on an alternative method for precise and uniform fabrication of 100μm-thick SU-8 microstructures on small-sized or non-circular samples. Standard spin-coating of high-viscosity resists is indeed known to induce large edge beads, leading to an air gap between the mask and the SU-8 photo-resist surface during UV photolithography. This results in a non uniform thickness deposition and in a poor pattern definition. This problem becomes highly critical in the case of small-sized samples. To overcome it, we have developed a soft thermal imprint method based on the use of a nano-imprint equipment and applicable whatever sample fragility, shape and size (from 2cm to 6 inches). After final photolithography, the SU8 pattern thickness variation profile is measured. Thickness uniformity is improved from 30% to 5% with a 5μm maximal deviation to the target value over 2cm-long samples.

  16. Investigation of the bond strength between the photo-sensitive polymer SU-8 and gold

    DEFF Research Database (Denmark)

    Nordström, Maria; Johansson, Alicia; Sánchez Noguerón, E.

    2005-01-01

    adhesion promotors between the SU-8 and Au; (ii) the influence of the processing sequence, keeping either Au or SU-8 as the bottom layer; (iii) the importance of the UV exposure dosage of the SU-8. For comparison, also the bond strength between SU-8 and other materials was measured. For SU-8 and Au without...

  17. Development of untethered SU-8 polymer scratch drive microrobots

    KAUST Repository

    Valencia Garcia, Manuel

    2011-01-01

    This paper presents the design, simulation, fabrication and testing of novel, untethered SU-8 polymer microrobots based on scratch drive actuators (SDAs). The design consists of two 100×120×10μm linked SDAs, individually operated close to their resonant frequencies. The resonant frequency and deflection behavior of an individual SDA can be controlled by its shape, thickness, and stiffening design features. As a result, paired SDAs can be actuated individually or simultaneously by a multifrequency driving signal, allowing for two-dimensional displacement. The fabrication process uses SU-8 as structural material and PMGI as sacrificial material. The SU-8 provides a flexible material for the SDA\\'s plates as well as the bushing. Finally, a Cr/Au layer is blanket deposited to provide electrical conductivity.

  18. Development of untethered SU-8 polymer scratch drive microrobots

    KAUST Repository

    Valencia Garcia, Manuel; Atallah, Tarek Nabil; Castro, David; Conchouso Gonzalez, David; Al Dosari, Mishari Ibraheem; Hammad, Rafat; Al Rawashdeh, Ehab Jamal; Zaher, Amir Omar; Kosel, Jü rgen; Foulds, Ian G.

    2011-01-01

    This paper presents the design, simulation, fabrication and testing of novel, untethered SU-8 polymer microrobots based on scratch drive actuators (SDAs). The design consists of two 100×120×10μm linked SDAs, individually operated close to their resonant frequencies. The resonant frequency and deflection behavior of an individual SDA can be controlled by its shape, thickness, and stiffening design features. As a result, paired SDAs can be actuated individually or simultaneously by a multifrequency driving signal, allowing for two-dimensional displacement. The fabrication process uses SU-8 as structural material and PMGI as sacrificial material. The SU-8 provides a flexible material for the SDA's plates as well as the bushing. Finally, a Cr/Au layer is blanket deposited to provide electrical conductivity.

  19. SU-8 as a Material for Microfabricated Particle Physics Detectors

    CERN Document Server

    Maoddi, Pietro; Jiguet, Sebastien; Renaud, Philippe

    2014-01-01

    Several recent detector te chnologies developed for particle physics applications are based on microfabricated structures. Dete ctors built with this approach generally exhibit the overall best performance in te rms of spatial and time resolution. Many properties of the SU-8 photoepoxy make it suitable for the manufacturing of microstructured particle detectors. This arti cle aims to review some emerging detector technologies making use of SU-8 microstructu ring, namely micropatte rn gaseous detectors and microfluidic scintillation detectors. Th e general working principle and main process steps for the fabrication of each device are reported, with a focus on the advantages brought to the device functionality by the us e of SU-8. A novel process based on multiple bonding steps for the fabrication of thin multila yer microfluidic scin tillation detectors developed by the authors is presented. Finally, a brief overview of the applications for the discussed devices is given.

  20. SU-8 Photolithography as a Toolbox for Carbon MEMS

    Directory of Open Access Journals (Sweden)

    Rodrigo Martinez-Duarte

    2014-09-01

    Full Text Available The use of SU-8 as precursor for glass-like carbon, or glassy carbon, is presented here. SU-8 carbonizes when subject to high temperature under inert atmosphere. Although epoxy-based precursors can be patterned in a variety of ways, photolithography is chosen due to its resolution and reproducibility. Here, a number of improvements to traditional photolithography are introduced to increase the versatility of the process. The shrinkage of SU-8 during carbonization is then detailed as one of the guidelines necessary to design carbon patterns. A couple of applications—(1 carbon-electrode dielectrophoresis for bioparticle manipulation; and (2 the use of carbon structures as micro-molds are also presented.

  1. Improved anti-stiction coating of SU-8 molds

    DEFF Research Database (Denmark)

    Lange, Jacob Moresco; Clausen, Casper Hyttel; Svendsen, Winnie Edith

    2010-01-01

    of the epoxy groups by oxygen plasma or sulfuric acid improves the deposition of FDTS. The deposition of FDTS on acid-activated and untreated SU-8 gave an identical well performing anti-stiction coating, as opposed to oxygen plasma activated surface which resulted in a poor FDTS coverage. In this paper...

  2. Combined electron beam and UV lithography in SU-8

    DEFF Research Database (Denmark)

    Gersborg-Hansen, Morten; Thamdrup, Lasse Højlund; Mironov, Andrej

    2007-01-01

    We present combined electron beam and UV lithography (CEUL) in SU-8 as a fast and flexible lithographic technique for prototyping of functional polymer devices and pattern transfer applications. CEUL is a lithographic technique suitable for defining both micrometer and nanometer scale features...

  3. Fabrication of SU-8 low frequency electrostatic energy harvester

    KAUST Repository

    Ramadan, Khaled S.; Foulds, Ian G.

    2011-01-01

    A 1500μm × 1500μm × 150μm out-of-plane, gap closing, electrostatic energy harvester is designed and fabricated to harvest low-frequency ambient vibrations. SU-8 is used to fabricate the proof mass (1200μm × 1200μm × 150μm) and the 5 m springs

  4. Microwave performance of photoresist-alumina microcomposites for batch fabrication of thick polymer-based dielectric structures

    International Nuclear Information System (INIS)

    Rashidian, Atabak; Klymyshyn, David M; Aligodarz, Mohammadreza Tayfeh; Boerner, Martin; Mohr, Jürgen

    2012-01-01

    The goal of this paper is to investigate the electrical properties of photoresist-alumina microcomposites with different portions of ceramic content. Substrates of photoresist-alumina microcomposites are fabricated and a comprehensive analysis is performed to characterize their dielectric constant and dielectric loss tangent at microwave frequencies up to 40 GHz. To evaluate the performance of these materials for microwave applications, the properties of various lithographically fabricated antenna elements are examined and analysed based on the measured electrical properties. The experimental results show that the electrical properties of the photoresist composite are nonlinearly affected by ceramic content and also a minimum percentage of ceramic portion is required to improve the electrical properties of the photoresist composite. For instance, comparison of 0 wt% with 23 wt% SU8-alumina shows that no reduction is achieved for the dielectric loss tangent. Comparison of 38 wt% with 48 wt% SU8-alumina microcomposite shows that the dielectric loss tangent is improved from 0.03 to 0.01 and the dielectric constant is increased from 3.8 to 5.0 at 25 GHz. These improvements can result in superior performance for the photoresist-based microwave components. (paper)

  5. Microwave performance of photoresist-alumina microcomposites for batch fabrication of thick polymer-based dielectric structures

    Science.gov (United States)

    Rashidian, Atabak; Klymyshyn, David M.; Tayfeh Aligodarz, Mohammadreza; Boerner, Martin; Mohr, Jürgen

    2012-10-01

    The goal of this paper is to investigate the electrical properties of photoresist-alumina microcomposites with different portions of ceramic content. Substrates of photoresist-alumina microcomposites are fabricated and a comprehensive analysis is performed to characterize their dielectric constant and dielectric loss tangent at microwave frequencies up to 40 GHz. To evaluate the performance of these materials for microwave applications, the properties of various lithographically fabricated antenna elements are examined and analysed based on the measured electrical properties. The experimental results show that the electrical properties of the photoresist composite are nonlinearly affected by ceramic content and also a minimum percentage of ceramic portion is required to improve the electrical properties of the photoresist composite. For instance, comparison of 0 wt% with 23 wt% SU8-alumina shows that no reduction is achieved for the dielectric loss tangent. Comparison of 38 wt% with 48 wt% SU8-alumina microcomposite shows that the dielectric loss tangent is improved from 0.03 to 0.01 and the dielectric constant is increased from 3.8 to 5.0 at 25 GHz. These improvements can result in superior performance for the photoresist-based microwave components.

  6. Designing of high-resolution photoresists: use of modern NMR ...

    Indian Academy of Sciences (India)

    Unknown

    Novolac copolymers were prepared by both one- and two- step procedures ... ture was diluted with hydrochloric acid (1 : 1) in an ice bath and the ..... spectrum of the negative photoresist. The almost super-. +. O. N2. SO2. O. O. DNQO. DNQO.

  7. SU-8-based microneedles for in vitro neural applications

    International Nuclear Information System (INIS)

    Altuna, Ane; Tijero, María; Berganzo, Javier; Salido, Rafa; Fernández, Luis J; Gabriel, Gemma; Guimerá, Anton; Villa, Rosa; Menéndez de la Prida, Liset

    2010-01-01

    This paper presents novel design, fabrication, packaging and the first in vitro neural activity recordings of SU-8-based microneedles. The polymer SU-8 was chosen because it provides excellent features for the fabrication of flexible and thin probes. A microprobe was designed in order to allow a clean insertion and to minimize the damage caused to neural tissue during in vitro applications. In addition, a tetrode is patterned at the tip of the needle to obtain fine-scale measurements of small neuronal populations within a radius of 100 µm. Impedance characterization of the electrodes has been carried out to demonstrate their viability for neural recording. Finally, probes are inserted into 400 µm thick hippocampal slices, and simultaneous action potentials with peak-to-peak amplitudes of 200–250 µV are detected.

  8. Investigation of the bond strength between the photo-sensitive polymer SU-8 and Au

    DEFF Research Database (Denmark)

    Nordstrom, Maria; Johansson, Alicia; Sanches-Noguerón, E.

    2004-01-01

    promotors between the SU-8 and Au (ii) the effect of the processing sequence, either keeping SU-8 as bottum layer or Au (iii) varying the UV exposure dosage of the SU-8. For comparison, also the bond strength between SU-8 and other materials was measured. We report on bond strength of 4.8 +/- 1.2 MPa...

  9. Carbonization of SU-8 Based Electrode for MEMS Supercapacitors

    OpenAIRE

    Liu, Yang

    2014-01-01

    Supercapacitors are more sustainable and environmentally friendly energy sources than traditional ones. To achieve the supercapacitors with both energy density and power density that mainly depend on the effective surface area of theelectrodes, SU-8 can be used for electrode material to fabricate 3D microstructures as the electrodes that increase the effective surface area significantly. The objective of this project is to fabricate the reliable electrodes of large surface area for supercapac...

  10. Fabrication of SU-8 microstructures for analytical microfluidic applications

    OpenAIRE

    Tuomikoski, Santeri

    2007-01-01

    Miniaturization of analytical devices has been an ongoing trend to improve performance of analytical tools. These systems have been microfabricated originally of silicon and glass, but polymers have become increasingly popular as alternative materials. Polymers are mostly used because the material costs are lower and fabrication processes are easier. However, those facts depend heavily on the fabrication method and particular polymer. In this thesis the usability of epoxy-polymer SU-8 has bee...

  11. Plasma etching of polymers like SU8 and BCB

    Science.gov (United States)

    Mischke, Helge; Gruetzner, Gabi; Shaw, Mark

    2003-01-01

    Polymers with high viscosity, like SU8 and BCB, play a dominant role in MEMS application. Their behavior in a well defined etching plasma environment in a RIE mode was investigated. The 40.68 MHz driven bottom electrode generates higher etch rates combined with much lower bias voltages by a factor of ten or a higher efficiency of the plasma with lower damaging of the probe material. The goal was to obtain a well-defined process for the removal and structuring of SU8 and BCB using fluorine/oxygen chemistry, defined using variables like electron density and collision rate. The plasma parameters are measured and varied using a production proven technology called SEERS (Self Excited Electron Resonance Spectroscopy). Depending on application and on Polymer several metals are possible (e.g., gold, aluminum). The characteristic of SU8 and BCB was examined in the case of patterning by dry etching in a CF4/O2 chemistry. Etch profile and etch rate correlate surprisingly well with plasma parameters like electron density and electron collision rate, thus allowing to define to adjust etch structure in situ with the help of plasma parameters.

  12. Photoresists for Microlithography

    Indian Academy of Sciences (India)

    This discovery led to a boom in the mass fabrica- tion of solid-state devices ... I ARTICLE. UV Ught. Mask. Developer \\ pattern formation in negative resist. C. The Conventional .... for lithography initially consisted of discharge lamps. As feature.

  13. Symmetry hierarchies and radiative corrections in the grand unified model SU(8)/sub L/ x SU(8)/sub R/

    International Nuclear Information System (INIS)

    Pirogov, Y.F.

    1982-01-01

    In the SU(8)/sub L/ x SU(8)/sub R/ model of precocious chiral unification, radiative corrections for the effective parameters sin 2 theta/sub W/(μ) and α(μ) are calculated in the one-loop approximation, neglecting contributions of the Higgs fields, and the unification mass M 8 is determined in the presence of a hierarchy of intermediate symmetries. It is shown that a natural hierarchy exists which leads to a decrease in sin 2 theta/sub W/(M/sub W/L) down to the value sin 2 theta/sub W/ = (1/5)--(1/4) together with a decrease in M 8 down to M 8 = 10 6 --10 7 GeV in comparison with the values in the absence of a hierarchy

  14. SU-8 as a material for lab-on-a-chip-based mass spectrometry.

    Science.gov (United States)

    Arscott, Steve

    2014-10-07

    This short review focuses on the application of SU-8 for the microchip-based approach to the miniaturization of mass spectrometry. Chip-based mass spectrometry will make the technology commonplace and bring benefits such as lower costs and autonomy. The chip-based miniaturization of mass spectrometry necessitates the use of new materials which are compatible with top-down fabrication involving both planar and non-planar processes. In this context, SU-8 is a very versatile epoxy-based, negative tone resist which is sensitive to ultraviolet radiation, X-rays and electron beam exposure. It has a very wide thickness range, from nanometres to millimetres, enabling the formation of mechanically rigid, very high aspect ratio, vertical, narrow width structures required to form microfluidic slots and channels for laboratory-on-a-chip design. It is also relatively chemically resistant and biologically compatible in terms of the liquid solutions used for mass spectrometry. This review looks at the impact and potential of SU-8 on the different parts of chip-based mass spectrometry - pre-treatment, ionization processes, and ion sorting and detection.

  15. Low-cost multilevel microchannel lab on chip: DF- 1000 series dry film photoresist as a promising enabler

    OpenAIRE

    Courson , Rémi; Cargou , Sébastien; Conédéra , Véronique; Fouet , Marc; Blatché , Charline; Serpentini , C.L.; Gué , Anne-Marie

    2014-01-01

    International audience; We demonstrate the use of a novel dry film photoresist DF-1000 series for the fabrication of multilevel microfluidic devices by combining a standard lithography technique and lamination technology. The optimization of the technological process enables achievement of high aspect ratio structures: 7 : 1 for free standing structures and 5 : 1 for channel structures. We proved that DF films feature a low autofluorescence level, similar to that of the SU-8 resist and compat...

  16. Fabrication of high-aspect ratio SU-8 micropillar arrays

    DEFF Research Database (Denmark)

    Amato, Letizia; Keller, Stephan S.; Heiskanen, Arto

    2012-01-01

    to the resolution limit of photolithography. This paper describes process optimization for the fabrication of dense SU-8 micropillar arrays (2.5μm spacing) with nominal height ⩾20μm and nominal diameter ⩽2.5μm (AR ⩾8). Two approaches, differing in temperature, ramping rate and duration of the baking steps were...... compared as part of the photolithographic processing, in order to evaluate the effect of baking on the pattern resolution. Additionally, during the post-processing, supercritical point drying and hard baking were introduced yielding pillars with diameter 1.8μm, AR=11 and an improved temporal stability....

  17. A High-Throughput SU-8Microfluidic Magnetic Bead Separator

    DEFF Research Database (Denmark)

    Bu, Minqiang; Christensen, T. B.; Smistrup, Kristian

    2007-01-01

    We present a novel microfluidic magnetic bead separator based on SU-8 fabrication technique for high through-put applications. The experimental results show that magnetic beads can be captured at an efficiency of 91 % and 54 % at flow rates of 1 mL/min and 4 mL/min, respectively. Integration...... of soft magnetic elements in the chip leads to a slightly higher capturing efficiency and a more uniform distribution of captured beads over the separation chamber than the system without soft magnetic elements....

  18. SU-8 etching in inductively coupled oxygen plasma

    DEFF Research Database (Denmark)

    Rasmussen, Kristian Hagsted; Keller, Stephan Sylvest; Jensen, Flemming

    2013-01-01

    Structuring or removal of the epoxy based, photo sensitive polymer SU-8 by inductively coupled plasma reactive ion etching (ICP-RIE) was investigated as a function of plasma chemistry, bias power, temperature, and pressure. In a pure oxygen plasma, surface accumulation of antimony from the photo......-initiator introduced severe roughness and reduced etch rate significantly. Addition of SF6 to the plasma chemistry reduced the antimony surface concentration with lower roughness and higher etch rate as an outcome. Furthermore the etch anisotropy could be tuned by controlling the bias power. Etch rates up to 800 nm...

  19. SU-8 hollow cantilevers for AFM cell adhesion studies

    Science.gov (United States)

    Martinez, Vincent; Behr, Pascal; Drechsler, Ute; Polesel-Maris, Jérôme; Potthoff, Eva; Vörös, Janos; Zambelli, Tomaso

    2016-05-01

    A novel fabrication method was established to produce flexible, transparent, and robust tipless hollow atomic force microscopy (AFM) cantilevers made entirely from SU-8. Channels of 3 μm thickness and several millimeters length were integrated into 12 μm thick and 40 μm wide cantilevers. Connected to a pressure controller, the devices showed high sealing performance with no leakage up to 6 bars. Changing the cantilever lengths from 100 μm to 500 μm among the same wafer allowed the targeting of various spring constants ranging from 0.5 to 80 N m-1 within a single fabrication run. These hollow polymeric AFM cantilevers were operated in the optical beam deflection configuration. To demonstrate the performance of the device, single-cell force spectroscopy experiments were performed with a single probe detaching in a serial protocol more than 100 Saccharomyces cerevisiae yeast cells from plain glass and glass coated with polydopamine while measuring adhesion forces in the sub-nanoNewton range. SU-8 now offers a new alternative to conventional silicon-based hollow cantilevers with more flexibility in terms of complex geometric design and surface chemistry modification.

  20. SU-8 hollow cantilevers for AFM cell adhesion studies

    International Nuclear Information System (INIS)

    Martinez, Vincent; Behr, Pascal; Vörös, Janos; Zambelli, Tomaso; Drechsler, Ute; Polesel-Maris, Jérôme; Potthoff, Eva

    2016-01-01

    A novel fabrication method was established to produce flexible, transparent, and robust tipless hollow atomic force microscopy (AFM) cantilevers made entirely from SU-8. Channels of 3 μm thickness and several millimeters length were integrated into 12 μm thick and 40 μm wide cantilevers. Connected to a pressure controller, the devices showed high sealing performance with no leakage up to 6 bars. Changing the cantilever lengths from 100 μm to 500 μm among the same wafer allowed the targeting of various spring constants ranging from 0.5 to 80 N m −1 within a single fabrication run. These hollow polymeric AFM cantilevers were operated in the optical beam deflection configuration. To demonstrate the performance of the device, single-cell force spectroscopy experiments were performed with a single probe detaching in a serial protocol more than 100 Saccharomyces cerevisiae yeast cells from plain glass and glass coated with polydopamine while measuring adhesion forces in the sub-nanoNewton range. SU-8 now offers a new alternative to conventional silicon-based hollow cantilevers with more flexibility in terms of complex geometric design and surface chemistry modification. (paper)

  1. A proof of concept of a BioMEMS glucose biosensor using microfabricated SU-8 films

    OpenAIRE

    Psoma, Sotiria D.

    2009-01-01

    The present project investigated and proved the concept of developing a novel BioMEMS glucose micro-biosensor using a simple one-step microfabrication process of the widely used SU-8 polymer. More specifically, the study focused on the investigation of the suitability of the SU-8 polymer as a matrix for enzyme immobilisation that is carried out during the microfabrication process. A comparative study between commercially available SU-8 and “customised” SU-8 solutions showed tha...

  2. Fabrication of SU-8 low frequency electrostatic energy harvester

    KAUST Repository

    Ramadan, Khaled S.

    2011-11-01

    A 1500μm × 1500μm × 150μm out-of-plane, gap closing, electrostatic energy harvester is designed and fabricated to harvest low-frequency ambient vibrations. SU-8 is used to fabricate the proof mass (1200μm × 1200μm × 150μm) and the 5 m springs. Different harvesters were designed to harvest at 50, 75 and 110 Hz. At 110 Hz, Simulations show that with an input vibration of 10 μm amplitude at the frequency of resonance of the structure, the energy harvester should generate an average output power density of 0.032μW/mm3. This is the most area-efficient low-frequency electrostatic harvester to-date. © 2011 IEEE.

  3. SU(8) family unification with boson-fermion balance

    CERN Multimedia

    CERN. Geneva

    2014-01-01

    Grand unification has been intensively investigated for over forty years, and many different approaches have been tried. In this talk I propose a model that involves three ingredients that do not appear in the usual constructions: (1) boson--fermion balance without full supersymmetry, (2) canceling the spin 1/2 fermion gauge anomalies against the anomaly from a gauged spin 3/2 gravitino, and (3) using a scalar field representation with non-zero U(1) generator to break the SU(8) gauge symmetry through a ground state which, before dynamical symmetry breaking, has a periodic U(1) generator structure. The model has a number of promising features: (1) natural incorporation of three families, (2) incorporation of the experimentally viable flipped SU(5) model, (3) a symmetry breaking pathway to the standard model using the scalar field required by boson-fermion balance, together with a stage of most attractive channel dynamical symmetry breaking, without postulating additional Higgs fields, (4) vanishing of bare Yuk...

  4. Supercritical fluid processing: a new dry technique for photoresist developing

    Science.gov (United States)

    Gallagher-Wetmore, Paula M.; Wallraff, Gregory M.; Allen, Robert D.

    1995-06-01

    Supercritical fluid (SCF) technology is investigated as a dry technique for photoresist developing. Because of their unique combination of gaseous and liquid-like properties, these fluids offer comparative or improved efficiencies over liquid developers and, particularly carbon dioxide, would have tremendous beneficial impact on the environment and on worker safety. Additionally, SCF technology offers the potential for processing advanced resist systems which are currently under investigation as well as those that may have been abandoned due to problems associated with conventional developers. An investigation of various negative and positive photoresist systems is ongoing. Initially, supercritical carbon dioxide (SC CO2) as a developer for polysilane resists was explored because the exposure products, polysiloxanes, are generally soluble in this fluid. These initial studies demonstrated the viability of the SCF technique with both single layer and bilayer systems. Subsequently, the investigation focused on using SC CO2 to produce negative images with polymers that would typically be considered positive resists. Polymers such as styrenes and methacrylates were chemically modified by fluorination and/or copolymerization to render them soluble in SC CO2. Siloxane copolymers and siloxane-modified methacrylates were examined as well. The preliminary findings reported here indicate the feasibility of using SC CO2 for photoresist developing.

  5. Surface modification of SU-8 for metal/SU-8 adhesion using RF plasma treatment for application in thermopile detectors

    International Nuclear Information System (INIS)

    Ashraf, Shakeel; Mattsson, Claes G; Thungström, Göran; Fondell, Mattis; Lindblad, Andreas

    2015-01-01

    This article reports on plasma treatment of SU-8 epoxy in order to enhance adhesive strength for metals. Its samples were fabricated on standard silicon wafers and treated with (O 2 and Ar) RF plasma at a power of 25 W at a low pressure of (3 × 10 −3 Torr) for different time spans (10–70 s). The sample surfaces were characterized in terms of contact angle, surface (roughness and chemistry) and using a tape test. During the contact angle measurement, it was observed that the contact angle was reduced from 73° to 5° (almost wet) and 23° for (O 2 and Ar) treated samples, respectively. The root mean square surface roughness was significantly increased by 21.5% and 37.2% for (O 2 and Ar) treatment, respectively. A pattern of metal squares was formed on the samples using photolithography for a tape test. An adhesive tape was applied to the samples and peeled off at 180°. The maximum adhesion results, more than 90%, were achieved for the O 2 -treated samples, whereas the Ar-treated samples showed no change. The XPS study shows the formation of new species in the O 2 -treated sample compared to the Ar-treated samples. The high adhesive results were due to the formation of hydrophilic groups and new O 2 species in the O 2 -treated samples, which were absent in Ar-treated samples. (paper)

  6. Progress in deep-UV photoresists

    Indian Academy of Sciences (India)

    Unknown

    This paper reviews the recent development and challenges of deep-UV photoresists and their ... small amount of acid, when exposed to light by photo- chemical ... anomalous insoluble skin and linewidth shift when the. PEB was delayed.

  7. Novel SU-8 based vacuum wafer-level packaging for MEMS devices

    DEFF Research Database (Denmark)

    Murillo, Gonzalo; Davis, Zachary James; Keller, Stephan Urs

    2010-01-01

    This work presents a simple and low-cost SU-8 based wafer-level vacuum packaging method which is CMOS and MEMS compatible. Different approaches have been investigated by taking advantage of the properties of SU-8, such as chemical resistance, optical transparence, mechanical reliability and versa......This work presents a simple and low-cost SU-8 based wafer-level vacuum packaging method which is CMOS and MEMS compatible. Different approaches have been investigated by taking advantage of the properties of SU-8, such as chemical resistance, optical transparence, mechanical reliability...

  8. SU-8 Composite Based “Lube-tape” for a Wide Range of Tribological Applications

    Directory of Open Access Journals (Sweden)

    Prabakaran Saravanan

    2014-05-01

    Full Text Available In a previous work, we have developed a perflouropolyether (PFPE lubricant droplet-filled SU-8 composite which promotes bonding between the molecules of SU-8 and PFPE and provides excellent boundary lubrication. The SU-8 + PFPE composite has enhanced the wear durability of SU-8 by more than four orders of magnitude. In this work, the same SU-8 + PFPE composite was used to fabricate a stand-alone laminate film called “Lube-tape”. It has integrated two layers of approximately 90 microns thickness each; the top layer is made of SU-8 + PFPE composite and the bottom layer of pristine SU-8. Thus, a single tape can have drastically contrasting high friction and low friction properties on its two surfaces. The composite side has the initial coefficient of friction ~7 times lower and the wear life more than four orders of magnitude than those of the pristine SU-8 side. This lube tape can be used on any load bearing surface to improve the tribological performance by simply pasting the pristine SU-8 side onto the substrate.

  9. Focusing properties of x-ray polymer refractive lenses from SU-8 resist layer

    Science.gov (United States)

    Snigirev, Anatoly A.; Snigireva, Irina; Drakopoulos, Michael; Nazmov, Vladimir; Reznikova, Elena; Kuznetsov, Sergey; Grigoriev, Maxim; Mohr, Jurgen; Saile, Volker

    2003-12-01

    Compound refractive lenses printed in Al and Be are becoming the key X-ray focusing and imaging components of beamline optical layouts at the 3rd generation synchrotron radiation sources. Recently proposed planar optical elements based on Si, diamond etc. may substantially broaden the spectrum of the refractive optics applicability. Planar optics has focal distances ranging from millimeters to tens of meters offering nano- and micro-focusing lenses, as well as beam condensers and collimators. Here we promote deep X-ray lithography and LIGA-type techniques to create high aspect-ratio lens structures for different optical geometries. Planar X-ray refractive lenses were manufactured in 1 mm thick SU-8 negative resist layer by means of deep synchrotron radiation lithography. The focusing properties of lenses were studied at ID18F and BM5 beamlines at the ESRF using monochromatic radiation in the energy range of 10 - 25 keV. By optimizing lens layout, mask making and resist processing, lenses of good quality were fabricated. The resolution of about 270 nm (FWHM) with gain in the order of 300 was measured at 14 keV. In-line holography of B-fiber was realized in imaging and projection mode with a magnification of 3 and 20, respectively. Submicron features of the fiber were clearly resolved. A radiation stability test proved that the fabricated lenses don't change focusing characteristics after dose of absorbed X-ray radiation of about 2 MJ/cm3. The unique radiation stability along with the high effficiency of SU8 lenses opens wide range of their synchrotron radiation applications such as microfocusing elements, condensers and collimators.

  10. Deep proton writing of high aspect ratio SU-8 micro-pillars on glass

    Energy Technology Data Exchange (ETDEWEB)

    Ebraert, Evert, E-mail: eebraert@b-phot.org; Rwamucyo, Ben; Thienpont, Hugo; Van Erps, Jürgen

    2016-12-15

    Deep proton writing (DPW) is a fabrication technology developed for the rapid prototyping of polymer micro-structures. We use SU-8, a negative resist, spincoated in a layer up to 720 μm-thick in a single step on borosilicate glass, for irradiation with a collimated 12 MeV energy proton beam. Micro-pillars with a slightly conical profile are irradiated in the SU-8 layer. We determine the optimal proton fluence to be 1.02 × 10{sup 4} μm{sup −2}, with which we are able to repeatably achieve micro-pillars with a top-diameter of 138 ± 1 μm and a bottom-diameter of 151 ± 3 μm. The smallest fabricated pillars have a top-diameter of 57 ± 5 μm. We achieved a root-mean-square sidewall surface roughness between 19 nm and 35 nm for the fabricated micro-pillars, measured over an area of 5 × 63.7 μm. We briefly discuss initial testing of two potential applications of the fabricated micro-pillars. Using ∼100 μm-diameter pillars as waveguides for gigascale integration optical interconnect applications, has shown a 4.7 dB improvement in optical multimode fiber-to-fiber coupling as compared to the case where an air–gap is present between the fibers at the telecom wavelength of 1550 nm. The ∼140 μm-diameter pillars were used for mold fabrication with silicone casting. The resulting mold can be used for hydrogel casting, to obtain hydrogel replicas mimicking human tissue for in vitro bio-chemical applications.

  11. Fabrication of three-dimensional millimeter-height structures using direct ultraviolet lithography on liquid-state photoresist for simple and fast manufacturing

    Science.gov (United States)

    Kim, Jungkwun; Yoon, Yong-Kyu

    2015-07-01

    A rapid three-dimensional (3-D) ultraviolet (UV) lithography process for the fabrication of millimeter-tall high aspect ratio complex structures is presented. The liquid-state negative-tone photosensitive polyurethane, LF55GN, has been directly photopatterned using multidirectionally projected UV light for 3-D micropattern formation. The proposed lithographic scheme enabled us to overcome the maximum height obtained with a photopatternable epoxy, SU8, which has been conventionally most commonly used for the fabrication of tall and high aspect ratio microstructures. Also, the fabrication process time has been significantly reduced by eliminating photoresist-baking steps. Computer-controlled multidirectional UV lithography has been employed to fabricate 3-D structures, where the UV-exposure substrate is dynamically tilt-rotating during UV exposure to create various 3-D ray traces in the polyurethane layer. LF55GN has been characterized to provide feasible fabrication conditions for the multidirectional UV lithography. Very tall structures including a 6-mm tall triangular slab and a 5-mm tall hexablaze have been successfully fabricated. A 4.5-mm tall air-lifted polymer-core bowtie monopole antenna, which is the tallest monopole structure fabricated by photolithography and subsequent metallization, has been successfully demonstrated. The antenna shows a resonant radiation frequency of 12.34 GHz, a return loss of 36 dB, and a 10 dB bandwidth of 7%.

  12. A Review on Surface Stress-Based Miniaturized Piezoresistive SU-8 Polymeric Cantilever Sensors

    Science.gov (United States)

    Mathew, Ribu; Ravi Sankar, A.

    2018-06-01

    In the last decade, microelectromechanical systems (MEMS) SU-8 polymeric cantilevers with piezoresistive readout combined with the advances in molecular recognition techniques have found versatile applications, especially in the field of chemical and biological sensing. Compared to conventional solid-state semiconductor-based piezoresistive cantilever sensors, SU-8 polymeric cantilevers have advantages in terms of better sensitivity along with reduced material and fabrication cost. In recent times, numerous researchers have investigated their potential as a sensing platform due to high performance-to-cost ratio of SU-8 polymer-based cantilever sensors. In this article, we critically review the design, fabrication, and performance aspects of surface stress-based piezoresistive SU-8 polymeric cantilever sensors. The evolution of surface stress-based piezoresistive cantilever sensors from solid-state semiconductor materials to polymers, especially SU-8 polymer, is discussed in detail. Theoretical principles of surface stress generation and their application in cantilever sensing technology are also devised. Variants of SU-8 polymeric cantilevers with different composition of materials in cantilever stacks are explained. Furthermore, the interdependence of the material selection, geometrical design parameters, and fabrication process of piezoresistive SU-8 polymeric cantilever sensors and their cumulative impact on the sensor response are also explained in detail. In addition to the design-, fabrication-, and performance-related factors, this article also describes various challenges in engineering SU-8 polymeric cantilevers as a universal sensing platform such as temperature and moisture vulnerability. This review article would serve as a guideline for researchers to understand specifics and functionality of surface stress-based piezoresistive SU-8 cantilever sensors.[Figure not available: see fulltext.

  13. Single-mode waveguides with SU-8 polymer core and cladding for MOEMS applications

    DEFF Research Database (Denmark)

    Nordström, Maria; Zauner, Dan; Boisen, Anja

    2007-01-01

    Fabrication and optical characterization of singlemode polymeric embedded waveguides are performed. A specific material combination (SU-8 2005 as core and the modified SU-8 mr-L 6050XP as cladding) is chosen in order to obtain a small refractive index difference for single-mode propagation combined...... can fabricate waveguides with an index difference in the order of 10−3, where both the core material and the cladding material are based on SU-8. The refractive index measurements are performed on thin polymeric films, while further optical characterizations are performed on waveguides with a height...

  14. Metal Oxide Nanoparticle Photoresists for EUV Patterning

    KAUST Repository

    Jiang, Jing; Chakrabarty, Souvik; Yu, Mufei; Ober, Christopher K.

    2014-01-01

    © 2014SPST. Previous studies of methacrylate based nanoparticle have demonstrated the excellent pattern forming capability of these hybrid materials when used as photoresists under 13.5 nm EUV exposure. HfO2 and ZrO2 methacrylate resists have

  15. Fabrication of thin SU-8 cantilevers: initial bending, release and time stability

    DEFF Research Database (Denmark)

    Keller, Stephan Urs; Haefliger, D.; Boisen, Anja

    2010-01-01

    SU-8 cantilevers with a thickness of 2 mu m were fabricated using a dry release method and two steps of SU-8 photolithography. The processing of the thin SU-8 film defining the cantilevers was experimentally optimized to achieve low initial bending due to residual stress gradients. In parallel......, the rotational deformation at the clamping point allowed a qualitative assessment of the device release from the fluorocarbon-coated substrate. The change of these parameters during several months of storage at ambient temperature was investigated in detail. The introduction of a long hard bake in an oven after...... development of the thin SU-8 film resulted in reduced cantilever bending due to removal of residual stress gradients. Further, improved time-stability of the devices was achieved due to the enhanced cross-linking of the polymer. A post-exposure bake at a temperature T-PEB = 50 degrees C followed by a hard...

  16. Single-mode waveguides with SU-8 polymer core and cladding for MOEMS applications

    OpenAIRE

    Nordström, Maria; Zauner, Dan; Boisen, Anja; Hübner, Jörg

    2007-01-01

    Fabrication and optical characterization of singlemode polymeric embedded waveguides are performed. A specific material combination (SU-8 2005 as core and the modified SU-8 mr-L 6050XP as cladding) is chosen in order to obtain a small refractive index difference for single-mode propagation combined with the conventional fabrication method UV lithography to facilitate the integration of different types of optical detection methods on lab-on-a-chip systems. We analyze the behavior of the refrac...

  17. PDMS as a sacrificial substrate for SU-8-based biomedical and microfluidic applications

    International Nuclear Information System (INIS)

    Patel, Jasbir N; Kaminska, Bozena; Gray, Bonnie L; Gates, Byron D

    2008-01-01

    We describe a new fabrication process utilizing polydimethylesiloxane (PDMS) as a sacrificial substrate layer for fabricating free-standing SU-8-based biomedical and microfluidic devices. The PDMS-on-glass substrate permits SU-8 photo patterning and layer-to-layer bonding. We have developed a novel PDMS-based process which allows the SU-8 structures to be easily peeled off from the substrate after complete fabrication. As an example, a fully enclosed microfluidic chip has been successfully fabricated utilizing the presented new process. The enclosed microfluidic chip uses adhesive bonding technology and the SU-8 layers from 10 µm to 450 µm thick for fully enclosed microchannels. SU-8 layers as large as the glass substrate are successfully fabricated and peeled off from the PDMS layer as single continuous sheets. The fabrication results are supported by optical microscopy and profilometry. The peel-off force for the 120 µm thick SU-8-based chips is measured using a voice coil actuator (VCA). As an additional benefit the release step leaves the input and the output of the microchannels accessible to the outside world facilitating interconnecting to the external devices

  18. Investigation on the mechanism of nitrogen plasma modified PDMS bonding with SU-8

    Energy Technology Data Exchange (ETDEWEB)

    Yang, Chengxin; Yuan, Yong J., E-mail: yongyuan@swjtu.edu.cn

    2016-02-28

    Graphical abstract: - Highlights: • Different nitrogen plasma processes modified PDMS bonding with SU-8 had been studied. • The effect of nitrogen plasma modification would produce the best result and the recovery of PDMS hydrophobicity could be delayed. - Abstract: Polydimethylsiloxane (PDMS) and SU-8 are both widely used for microfluidic system. However, it is difficult to permanently seal SU-8 microfluidic channels using PDMS with conventional methods. Previous efforts of combining these two materials mainly employed oxygen plasma modified PDMS. The nitrogen plasma modification of PDMS bonding with SU-8 is rarely studied in recent years. In this work, the mechanism of nitrogen plasma modified PDMS bonding with SU-8 was investigated. The fourier-transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and contact angle of a water droplet were used to analyze the nitrogen plasma modified surface and the hydrophilic stability of PDMS samples. Pull-off tests were used for estimating the bonding effect of interface between nitrogen plasma modified PDMS and SU-8.

  19. Epoxy based photoresist/carbon nanoparticle composites

    DEFF Research Database (Denmark)

    Lillemose, Michael; Gammelgaard, Lauge; Richter, Jacob

    2008-01-01

    We have fabricated composites of SU-8 polymer and three different types of carbon nanoparticles (NPs) using ultrasonic mixing. Structures of composite thin films have been patterned on a characterization chip with standard UV photolithography. Using a four-point bending probe, a well defined stress...... is applied to the composite thin film and we have demonstrated that the composites are piezoresistive. Stable gauge factors of 5-9 have been measured, but we have also observed piezoresistive responses with gauge factors as high as 50. As SU-8 is much softer than silicon and the gauge factor of the composite...

  20. On symmetry hierarchy and radiative corrections in the grand unified model SU(8)sub(L)xSU(8)sub(R)

    International Nuclear Information System (INIS)

    Pirogov, Yu.F.

    1982-01-01

    In the model of precocious chiral unification SU(8)sub(L)xSU(8)sub(R) radiative corrections are calculated for the effective parameters sin 2 thetaw(μ) and α(μ) and the unification mass M 8 is determifed in presence of a hierarchy of intermediate symmetries. The one-loop approximation is used and contributions from the Higgs fields are neglected. It is shown that a natural hierarchy exists leading to a decrease of sinsup(2)thetasub(w)(Msub(wsub(L))) up to sinsup(2)thetasub(w)=1/5-1/4 together with a decrease of M 8 up to M 8 =10 6 -10 7 GeV, as compared with the magnitudes without the hierarchy [ru

  1. Novel SU-8/Ionic Liquid Composite for Tribological Coatings and MEMS

    Directory of Open Access Journals (Sweden)

    Leili Batooli

    2015-05-01

    Full Text Available Tribology of SU-8 polymer is increasingly relevant due to bursting use of this material in a variety of applications. This study is directed towards introduction and investigation of a novel self-lubricating composite of an ionic liquid (IL in SU-8. The new material can be utilized for fabrication of lubricating polymer coating with tunable surface properties or SU8-made elements for microelectromechanical systems (MEMS with enhanced tribological performance. It is shown that addition of IL drastically alters water affinity of the composite while UV patternability remains unmodified. A lower coefficient of friction and wear has been obtained for two investigated compositions with 4 and 10 wt % ionic liquid.

  2. Low Cost SU8 Based Above IC Process for High Q RF Power Inductors Integration

    International Nuclear Information System (INIS)

    Ghannam, A.; Bourrier, D.; Viallon, Ch.; Parra, Th.

    2011-01-01

    This paper presents a new process for integration of high-Q RF power inductors above low resistivity silicon substrates. The process uses the SU8 resin as a dielectric layer. The aim of using the SU8 is to form thick dielectric layer that can enhance the performance of the inductors. The flexibility of the process enables the possibility to realize complex shaped planar inductors with various dielectric and metal thicknesses to meet the requirements of the application. Q values of 55 at 5 GHz has been demonstrated for an inductance value of 0.8 nH using a 60 μm thick SU8 layer and 30 μm thick copper ribbons. (author)

  3. 3-dimensional free standing micro-structures by proton beam writing of Su 8-silver nanoParticle polymeric composite

    Science.gov (United States)

    Igbenehi, H.; Jiguet, S.

    2012-09-01

    Proton beam lithography a maskless direct-write lithographic technique (well suited for producing 3-Dimensional microstructures in a range of resist and semiconductor materials) is demonstrated as an effective tool in the creation of electrically conductive freestanding micro-structures in an Su 8 + Nano Silver polymer composite. The structures produced show non-ohmic conductivity and fit the percolation theory conduction model of tunneling of separated nanoparticles. Measurements show threshold switching and a change in conductivity of at least 4 orders of magnitude. The predictable range of protons in materials at a given energy is exploited in the creation of high aspect ratio, free standing micro-structures, made from a commercially available SU8 Silver nano-composite (GMC3060 form Gersteltec Inc. a negative tone photo-epoxy with added metallic nano-particles(Silver)) to create films with enhanced electrical properties when exposed and cured. Nano-composite films are directly written on with a finely focused MeV accelerated Proton particle beam. The energy loss of the incident proton beams in the target polymer nano- composite film is concentrated at the end of its range, where damage occurs; changing the chemistry of the nano-composite film via an acid initiated polymerization - creating conduction paths. Changing the energy of the incident beams provide exposed regions with different penetration and damage depth - exploited in the demonstrated cantilever microstructure.

  4. Polymer SU-8 Based Microprobes for Neural Recording and Drug Delivery

    Science.gov (United States)

    Altuna, Ane; Fernandez, Luis; Berganzo, Javier

    2015-06-01

    This manuscript makes a reflection about SU-8 based microprobes for neural activity recording and drug delivery. By taking advantage of improvements in microfabrication technologies and using polymer SU-8 as the only structural material, we developed several microprobe prototypes aimed to: a) minimize injury in neural tissue, b) obtain high-quality electrical signals and c) deliver drugs at a micrometer precision scale. Dedicated packaging tools have been developed in parallel to fulfill requirements concerning electric and fluidic connections, size and handling. After these advances have been experimentally proven in brain using in vivo preparation, the technological concepts developed during consecutive prototypes are discussed in depth now.

  5. POLYMER SU-8 BASED MICROPROBES FOR NEURAL RECORDING AND DRUG DELIVERY

    Directory of Open Access Journals (Sweden)

    Ane eAltuna

    2015-06-01

    Full Text Available This manuscript makes a reflection about SU-8 based microprobes for neural activity recording and drug delivery. By taking advantage of improvements in microfabrication technologies and using polymer SU-8 as the only structural material, we developed several microprobe prototypes aimed to: a minimize injury in neural tissue, b obtain high-quality electrical signals and c deliver drugs at a micrometer precision scale. Dedicated packaging tools have been developed in parallel to fulfill requirements concerning electric and fluidic connections, size and handling. After these advances have been experimentally proven in brain using in vivo preparation, the technological concepts developed during consecutive prototypes are discussed in depth now.

  6. Studying the mechanism of hybrid nanoparticle EUV photoresists

    KAUST Repository

    Zhang, Ben

    2015-03-23

    This work focuses on the investigation of dual tone patterning mechanism with hybrid inorganic/organic photoresists. Hafnium oxide (HfO2) modified with acrylic acid was prepared and the influence of electrolyte solutions as well as pH on its particle size change was investigated. The average particle size and zeta potential of the nanoparticles in different electrolyte solutions were measured. The results show that addition of different concentrations of electrolytes changed the hydrodynamic diameter of nanoparticles in water. Increased concentration of tetramethyl ammonium hydroxide (TMAH) caused the zeta potential of nanoparticles to change from positive to negative and its hydrodynamic diameter to increase from 40 nm to 165 nm. In addition, increasing concentration of triflic acid led to the decrease of particle size and zeta potential. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

  7. Studying the mechanism of hybrid nanoparticle EUV photoresists

    KAUST Repository

    Zhang, Ben; Li, Li; Jiang, Jing; Neisser, Mark; Chun, Jun Sung; Ober, Christopher K.; Giannelis, Emmanuel P.

    2015-01-01

    This work focuses on the investigation of dual tone patterning mechanism with hybrid inorganic/organic photoresists. Hafnium oxide (HfO2) modified with acrylic acid was prepared and the influence of electrolyte solutions as well as pH on its particle size change was investigated. The average particle size and zeta potential of the nanoparticles in different electrolyte solutions were measured. The results show that addition of different concentrations of electrolytes changed the hydrodynamic diameter of nanoparticles in water. Increased concentration of tetramethyl ammonium hydroxide (TMAH) caused the zeta potential of nanoparticles to change from positive to negative and its hydrodynamic diameter to increase from 40 nm to 165 nm. In addition, increasing concentration of triflic acid led to the decrease of particle size and zeta potential. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

  8. Dense vertical SU-8 microneedles drawn from a heated mold with precisely controlled volume

    International Nuclear Information System (INIS)

    Xiang, Zhuolin; Wang, Hao; Yen, Shih-Cheng; Lee, Chengkuo; Murugappan, Suresh Kanna; Pastorin, Giorgia

    2015-01-01

    Drawing lithography technology has recently become a popular technique to fabricate (3D) microneedles. The conventional drawing process shows some limitations in fabricating dense, scale-up and small microneedles. In this study, we demonstrate a new drawing lithography process from a self-loading mold which is able to overcome these challenges. Different from the conventional molds which have difficult alignment and loading issues, a released SU-8 membrane is attached onto a SU-8 coated wafer to generate an innovative self-loading mold. The physically distinct SU-8 colloid in this mold successfully avoids the merging of the microneedle tips in the drawing process. Meanwhile, the same SU-8 colloid in mold can provide microneedles with uniform lengths on a large surface area. Furthermore, a low temperature drawing process with this improved technique prevents sharp tips from bending during the solidification stage. Remarkably, this new drawing lithography technology can fabricate microneedles with various lengths and they are strong enough to penetrate the outermost skin layer, namely the stratum corneum. The spacing between two adjacent microneedles is optimized to maximize the penetration rate through the skin. Histology images and drug diffusion testing demonstrate that microchannels are successfully created and the drugs can permeate the tissue under the skin. The fabricated microneedles are demonstrated to deliver insulin in vivo and lower blood glucose levels, suggesting future possible applications for minimally invasive transdermal delivery of macromolecules. (paper)

  9. Micro-particle filter made in SU-8 for biomedical applications

    DEFF Research Database (Denmark)

    Noeth, Nadine-Nicole; Keller, Stephan Urs; Fetz, Stefanie

    2009-01-01

    We have integrated a micro-particle filter in a polymer cantilever to filter micro-particles from a fluid while simultaneously measuring the amount of filtered particles. In a 3,8 mum thick SU-8 cantilever a filter was integrated with pore sizes between 3 and 30 mum. The chip was inserted in a mi...

  10. Humidity influence on the adhesion of SU-8 polymer from MEMS applications

    Directory of Open Access Journals (Sweden)

    Birleanu Corina

    2017-01-01

    Full Text Available In this paper, the adhesion behaviors of SU-8 polymer thin film from MEMS application were investigated as a function of relative humidity. The adhesion test between the AFM tip and SU-8 polymer have been extensively studied using the atomic force microscope (AFM, for a relative humidity (RH varying between 20 and 90%. The samples for tests are SU-8 polymers hard baked at different temperatures. The hard bake temperature changes the tribo-mechanical properties of polymers. The paper reports the measurements and the modeling of adhesion forces versus humidity in controlled ranges between 20 to 90%RH. To investigate the effect of relative humidity on adhesion for SU-8 polymer hard baked we used an analytical method which encompasses the effect of capillarity as well as the solid-to-solid interaction. While the capillary force expression is considered to be the sum of the superficial tension and the Laplace force for the solid-solid interaction is expressed by the Derjagin, Muller and Toropov (DMT model of solids adhesion. The analytical results obtained are in accordance with those obtained experimentally.

  11. Temperature effects in Au piezoresistors integrated in SU-8 cantilever chips

    DEFF Research Database (Denmark)

    Johansson, Alicia; Hansen, Ole; Hales, Jan Harry

    2006-01-01

    We present a cantilever-based biosensor chip made for the detection of biochemical molecules. The device is fabricated entirely in the photosensitive polymer SU-8 except for integrated piezoresistors made of Au. The integrated piezoresistors are used to monitor the surface stress changes due to b...

  12. Simulation and experimental validation of a SU-8 based PCR thermocycler chip with integrated heaters and temperature sensor

    DEFF Research Database (Denmark)

    El-Ali, Jamil; Perch-Nielsen, Ivan R.; Poulsen, Claus Riber

    2004-01-01

    We present a SU-8 based polymerase chain reaction (PCR) chip with integrated platinum thin film heaters and temperature sensor. The device is fabricated in SU-8 on a glass substrate. The use of SU-8 provides a simple microfabrication process for the PCR chamber, controllable surface properties......C/s, respectively, the performance of the chip is comparable with the best silicon micromachined PCR chips presented in the literature. The SU-8 chamber surface was found to be PCR compatible by amplification of yeast gene ribosomal protein S3 and Campylobacter gene cadF. The PCR compatibility of the chamber...

  13. Invisible Security Printing on Photoresist Polymer Readable by Terahertz Spectroscopy

    OpenAIRE

    Hee Jun Shin; Min-Cheol Lim; Kisang Park; Sae-Hyung Kim; Sung-Wook Choi; Gyeongsik Ok

    2017-01-01

    We experimentally modulate the refractive index and the absorption coefficient of an SU-8 dry film in the terahertz region by UV light (362 nm) exposure with time dependency. Consequently, the refractive index of SU-8 film is increased by approximately 6% after UV light exposure. Moreover, the absorption coefficient also changes significantly. Using the reflective terahertz imaging technique, in addition, we can read security information printed by UV treatment on an SU-8 film that is transpa...

  14. Biofriendly bonding processes for nanoporous implantable SU-8 microcapsules for encapsulated cell therapy.

    Science.gov (United States)

    Nemani, Krishnamurthy; Kwon, Joonbum; Trivedi, Krutarth; Hu, Walter; Lee, Jeong-Bong; Gimi, Barjor

    2011-01-01

    Mechanically robust, cell encapsulating microdevices fabricated using photolithographic methods can lead to more efficient immunoisolation in comparison to cell encapsulating hydrogels. There is a need to develop adhesive bonding methods which can seal such microdevices under physiologically friendly conditions. We report the bonding of SU-8 based substrates through (i) magnetic self assembly, (ii) using medical grade photocured adhesive and (iii) moisture and photochemical cured polymerization. Magnetic self-assembly, carried out in biofriendly aqueous buffers, provides weak bonding not suitable for long term applications. Moisture cured bonding of covalently modified SU-8 substrates, based on silanol condensation, resulted in weak and inconsistent bonding. Photocured bonding using a medical grade adhesive and of acrylate modified substrates provided stable bonding. Of the methods evaluated, photocured adhesion provided the strongest and most stable adhesion.

  15. Mode-locked fiber laser using SU8 resist incorporating carbon nanotubes

    Science.gov (United States)

    Hernandez-Romano, Ivan; Mandridis, Dimitrios; May-Arrioja, Daniel A.; Sanchez-Mondragon, Jose J.; Delfyett, Peter J.

    2011-06-01

    We report the fabrication of a saturable absorber made of a novel polymer SU8 doped with Single Wall Carbon Nanotubes (SWCNTs). A passive mode-locked ring cavity fiber laser was built with a 100 μm thick SU8/SWCNT film inserted between two FC/APC connectors. Self-starting passively mode-locked lasing operation was observed at 1572.04 nm, with a FWHM of 3.26 nm. The autocorrelation trace was 1.536 ps corresponding to a pulse-width of 871 fs. The time-bandwidth product was 0.344, which is close enough to transform-limited sech squared pulses. The repetition rate was 21.27 MHz, and a maximum average output power of 1 mW was also measured.

  16. Electromagnetic characterization of strontium ferrite powders in series 2000, SU8 polymer

    International Nuclear Information System (INIS)

    Sholiyi, Olusegun; Williams, John

    2014-01-01

    In this article, electromagnetic characterization of strontium hexaferrite powders and composites with SU8 was carried out to determine their compatibility with micro and millimeter wave fabrications. The structures of both powders and their composites were scanned with electron microscope to produce the SEM images. Two powder sizes (0.8–1.0 μm and 3–6 μm), were mixed with SU8, spin cast and patterned on wafer, and then characterized using energy dispersive x-ray spectrometry, ferromagnetic resonance (FMR) and vibrating sample magnetometry. In this investigation, FMRs of the samples were determined at 60 GHz while their complex permittivity and permeability were determined using rectangular waveguide method of characterization between 26.5 and 40 GHz frequency range. The results obtained show no adverse effects on the electromagnetic properties of the composites except some slight shift in the resonant frequencies due to anisotropic field of the samples. (paper)

  17. Drift study of SU8 cantilevers in liquid and gaseous environments.

    Science.gov (United States)

    Tenje, Maria; Keller, Stephan; Dohn, Søren; Davis, Zachary J; Boisen, Anja

    2010-05-01

    We present a study of the drift, in terms of cantilever deflections without probe/target interactions, of polymeric SU8 cantilevers. The drift is measured in PBS buffer (pH 7.4) and under vacuum (1mbar) conditions. We see that the cantilevers display a large drift in both environments. We believe this is because the polymer matrix absorbs liquid in one situation whereas it is being degassed in the other. An inhomogeneous expansion/contraction of the cantilever is seen because one surface of the cantilever may still have remains of the release layer from the fabrication. To further study the effect, we coat the cantilevers with a hydrophobic coating, perfluorodecyltrichlorosilane (FDTS). Fully encapsulating the SU8 cantilever greatly reduces the drift in liquid whereas a less significant change is seen in vacuum.

  18. Drift study of SU8 cantilevers in liquid and gaseous environments

    DEFF Research Database (Denmark)

    Tenje, Maria; Keller, Stephan Sylvest; Dohn, Søren

    2010-01-01

    We present a study of the drift, in terms of cantilever deflections without probe/target interactions, of polymeric SU8 cantilevers. The drift is measured in PBS buffer (pH 7.4) and under vacuum (1 mbar) conditions. We see that the cantilevers display a large drift in both environments. We believe...... coat the cantilevers with a hydrophobic coating, perfluorodecyltrichlorosilane (FDTS). Fully encapsulating the SU8 cantilever greatly reduces the drift in liquid whereas a less significant change is seen in vacuum....... this is because the polymer matrix absorbs liquid in one situation whereas it is being degassed in the other. An inhomogeneous expansion/contraction of the cantilever is seen because one surface of the cantilever may still have remains of the release layer from the fabrication. To further study the effect, we...

  19. Electromagnetic characterization of strontium ferrite powders in series 2000, SU8 polymer

    Science.gov (United States)

    Sholiyi, Olusegun; Williams, John

    2014-12-01

    In this article, electromagnetic characterization of strontium hexaferrite powders and composites with SU8 was carried out to determine their compatibility with micro and millimeter wave fabrications. The structures of both powders and their composites were scanned with electron microscope to produce the SEM images. Two powder sizes (0.8-1.0 μm and 3-6 μm), were mixed with SU8, spin cast and patterned on wafer, and then characterized using energy dispersive x-ray spectrometry, ferromagnetic resonance (FMR) and vibrating sample magnetometry. In this investigation, FMRs of the samples were determined at 60 GHz while their complex permittivity and permeability were determined using rectangular waveguide method of characterization between 26.5 and 40 GHz frequency range. The results obtained show no adverse effects on the electromagnetic properties of the composites except some slight shift in the resonant frequencies due to anisotropic field of the samples.

  20. Fabrication of thin SU-8 cantilevers: initial bending, release and time stability

    International Nuclear Information System (INIS)

    Keller, Stephan; Boisen, Anja; Haefliger, Daniel

    2010-01-01

    SU-8 cantilevers with a thickness of 2 µm were fabricated using a dry release method and two steps of SU-8 photolithography. The processing of the thin SU-8 film defining the cantilevers was experimentally optimized to achieve low initial bending due to residual stress gradients. In parallel, the rotational deformation at the clamping point allowed a qualitative assessment of the device release from the fluorocarbon-coated substrate. The change of these parameters during several months of storage at ambient temperature was investigated in detail. The introduction of a long hard bake in an oven after development of the thin SU-8 film resulted in reduced cantilever bending due to removal of residual stress gradients. Further, improved time-stability of the devices was achieved due to the enhanced cross-linking of the polymer. A post-exposure bake at a temperature T PEB = 50 °C followed by a hard bake at T HB = 90 °C proved to be optimal to ensure low cantilever bending and low rotational deformation due to excellent device release and low change of these properties with time. With the optimized process, the reproducible fabrication of arrays with 2 µm thick cantilevers with a length of 500 µm and an initial bending of less than 20 µm was possible. The theoretical spring constant of these cantilevers is k = 4.8 ± 2.5 mN m −1 , which is comparable to the value for Si cantilevers with identical dimensions and a thickness of 500 nm.

  1. Hydrophobic coating of microfluidic chips structured by SU-8 polymer for segmented flow operation

    International Nuclear Information System (INIS)

    Schumacher, J T; Grodrian, A; Metze, J; Kremin, C; Hoffmann, M

    2008-01-01

    We present a hydrophobization procedure for SU-8-based microfluidic chips on borofloat substrates. Different layouts of gold electrodes passivated by the polymer have been investigated. The chips are used for segmented flow in a two-fluid mode that requires a distinct hydrophobicity of the channel walls which is generated by the use of specific silane. In this paper we describe the production and silanization of the chips and demonstrate segmented flow operation

  2. Refractive index modulation of SU-8 polymer optical waveguides by means of hybrid photothermal process

    OpenAIRE

    Salazar-Miranda, D.; Castillón, F. F.; Sánchez-Sánchez, J. J.; Angel-Valenzuela, J. L.; Márquez, H.

    2010-01-01

    This paper describes the fabrication and characterization of multimode polymer optical waveguides obtained using a SU-8-2005 polymer by means of photolithographic process. Critical information about refractive index modulation of polymer waveguides as function of fabrication parameters as pre-baked and ultraviolet exposure times is presented. Physical properties of the waveguides were determined by means prism-coupling technique, optical and SEM microscopy. Este trabajo describe la fabrica...

  3. SU-8 based microdevices to study self-induced chemotaxis in 3D microenvironments

    Science.gov (United States)

    Ayuso, Jose; Monge, Rosa; Llamazares, Guillermo; Moreno, Marco; Agirregabiria, Maria; Berganzo, Javier; Doblaré, Manuel; Ochoa, Iñaki; Fernandez, Luis

    2015-05-01

    Tissues are complex three-dimensional structures in which cell behaviour is frequently guided by chemotactic signals. Although starvation and nutrient restriction induce many different chemotactic processes, the recreation of such conditions in vitro remains difficult when using standard cell culture equipment. Recently, microfluidic techniques have arisen as powerful tools to mimic such physiological conditions. In this context, microfluidic three-dimensional cell culture systems require precise control of cell/hydrogel location because samples need to be placed within a microchamber without obstruction of surrounding elements. In this article, SU-8 is studied as structural material for the fabrication of complex cell culture devices due to its good mechanical properties, low gas permeability and sensor integration capacity. In particular, this manuscript presents a SU-8 based microdevice designed to create “self-induced” medium starvation, based on the combination of nutrient restriction and natural cell metabolism. Results show a natural migratory response towards nutrient source, showing how cells adapt to their own microenvironment modifications. The presented results demonstrate the SU-8 potential for microdevice fabrication applied to cell culture.

  4. SU-8 cantilevers for bio/chemical sensing; Fabrication, characterisation and development of novel read-out methods

    DEFF Research Database (Denmark)

    Nordström, M.; Keller, Stephan Urs; Lillemose, Michael

    2008-01-01

    Here, we present the activities within our research group over the last five years with cantilevers fabricated in the polymer SU-8. We believe that SU-8 is an interesting polymer for fabrication of cantilevers for bio/chemical sensing due to its simple processing and low Young's modulus. We show...

  5. Metal Oxide Nanoparticle Photoresists for EUV Patterning

    KAUST Repository

    Jiang, Jing

    2014-01-01

    © 2014SPST. Previous studies of methacrylate based nanoparticle have demonstrated the excellent pattern forming capability of these hybrid materials when used as photoresists under 13.5 nm EUV exposure. HfO2 and ZrO2 methacrylate resists have achieved high resolution (∼22 nm) at a very high EUV sensitivity (4.2 mJ/cm2). Further investigations into the patterning process suggests a ligand displacement mechanism, wherein, any combination of a metal oxide with the correct ligand could generate patterns in the presence of the suitable photoactive compound. The current investigation extends this study by developing new nanoparticle compositions with transdimethylacrylic acid and o-toluic acid ligands. This study describes their synthesis and patterning performance under 248 nm KrF laser (DUV) and also under 13.5 nm EUV exposures (dimethylacrylate nanoparticles) for the new resist compositions.

  6. Novolak resin-based negative photoresists for deep UV lithography

    Indian Academy of Sciences (India)

    Administrator

    Presented at First International Conference of Scott Research. Forum, Scott Christian College, Nagercoil, Tamil Nadu, India on 19 April 2008 ..... The exposure was carried out on a DUV stepper operating on Hg-Xe lamp 500 W delivering a dosage of 3⋅2 mJ. Development was done using tetra methyl ammonium hydroxide ...

  7. Single photoresist masking for local porous Si formation

    International Nuclear Information System (INIS)

    Hourdakis, E; Nassiopoulou, A G

    2014-01-01

    A simple process for local electrochemical porous Si formation on a Si wafer using a photoresist mask was developed. In this respect, the AZ9260 photoresist from MicroChemicals was used, which is easily removed by simple immersion in acetone after the electrochemical process. The photoresist layer thickness and its adhesion to the Si substrate were optimized for increased etch resistance to the anodization solution. Using the above process, mesoporous Si layers as thick as 50 μm were locally formed on the Si wafer through the photoresist mask. The developed process paves the way towards a simple industrial batch Si technology process for the fabrication of mixed Si wafers containing local porous Si areas. These wafers are very interesting for future system-on-chip (SoC) applications, including RF analog/digital and sensors/electronics SoCs. (technical note)

  8. Optimized piranha etching process for SU8-based MEMS and MOEMS construction

    International Nuclear Information System (INIS)

    Holmes, Matthew; Keeley, Jared; Hurd, Katherine; Hawkins, Aaron; Schmidt, Holger

    2010-01-01

    We demonstrate the optimization of the concentration, temperature and cycling of a piranha (H 2 O 2 :H 2 SO 4 ) mixture that produces high yields while quickly etching hollow structures made using a highly crosslinked SU8 polymer sacrificial core. The effects of the piranha mixture on the thickness, refractive index and roughness of common micro-electromechanical systems and micro-opto-electromechanical systems fabrication materials (SiN, SiO 2 and Si) were determined. The effectiveness of the optimal piranha mixture was demonstrated in the construction of hollow anti-resonant reflecting optical waveguides

  9. Optimized piranha etching process for SU8-based MEMS and MOEMS construction

    Science.gov (United States)

    Holmes, Matthew; Keeley, Jared; Hurd, Katherine; Schmidt, Holger; Hawkins, Aaron

    2010-11-01

    We demonstrate the optimization of the concentration, temperature and cycling of a piranha (H2O2:H2SO4) mixture that produces high yields while quickly etching hollow structures made using a highly crosslinked SU8 polymer sacrificial core. The effects of the piranha mixture on the thickness, refractive index and roughness of common micro-electromechanical systems and micro-opto-electromechanical systems fabrication materials (SiN, SiO2 and Si) were determined. The effectiveness of the optimal piranha mixture was demonstrated in the construction of hollow anti-resonant reflecting optical waveguides.

  10. Optimized piranha etching process for SU8-based MEMS and MOEMS construction

    OpenAIRE

    Holmes, Matthew; Keeley, Jared; Hurd, Katherine; Schmidt, Holger; Hawkins, Aaron

    2010-01-01

    We demonstrate the optimization of the concentration, temperature and cycling of a piranha (H2O2:H2SO4) mixture that produces high yields while quickly etching hollow structures made using a highly crosslinked SU8 polymer sacrificial core. The effects of the piranha mixture on the thickness, refractive index and roughness of common micro-electromechanical systems and micro-opto-electromechanical systems fabrication materials (SiN, SiO2 and Si) were determined. The effectiveness of the optimal...

  11. Microfabrication of pre-aligned fiber bundle couplers using ultraviolet lithography of SU-8

    OpenAIRE

    Yang, Ren; Soper, Steven A.; Wang, Wanjun

    2006-01-01

    This paper describes the design, microfabrication and testing of a pre-aligned array of fiber couplers using direct UV-lithography of SU-8. The fiber coupler array includes an out-of-plane refractive microlens array and two fiberport collimator arrays. With the optical axis of the pixels parallel to the substrate, each pixel of the microlens array can be pre-aligned with the corresponding pixels of the fiberport collimator array as defined by the lithography mask design. This out-of-plane pol...

  12. SU-8 Cantilevers for Bio/chemical Sensing; Fabrication, Characterisation and Development of Novel Read-out Methods

    OpenAIRE

    Anja Boisen; Mogens Havsteen-Jakobsen; Gabriela Blagoi; Daniel Haefliger; Søren Dohn; Alicia Johansson; Michael Lillemose; Stephan Keller; Maria Nordström

    2008-01-01

    Here, we present the activities within our research group over the last five years with cantilevers fabricated in the polymer SU-8. We believe that SU-8 is an interesting polymer for fabrication of cantilevers for bio/chemical sensing due to its simple processing and low Young's modulus. We show examples of different integrated read-out methods and their characterisation. We also show that SU-8 cantilevers have a reduced sensitivity to changes in the environmental temperature and pH of the bu...

  13. Effect of size and moisture on the mechanical behavior of SU-8 thin films

    Science.gov (United States)

    Robin, C. J.; Jonnalagadda, K. N.

    2016-02-01

    The mechanical properties of SU-8 were investigated in conjunction with size effect, mechanical anisotropy and moisture absorption. Uniaxial tensile experiments were conducted on SU-8 films of 500 nm and 2 μm thickness. A spin coating process was used to fabricate the films with one set from a single coat (single layer) and the others containing multiple coats (multilayer) with pre-baking in between. The stress versus strain response was obtained from in situ optical experiments and a digital image correlation method. Compared to single layer films, the multilayer films showed a significant increase in mechanical properties as well as in-plane anisotropy. This anisotropy was confirmed using Fourier transform infrared spectroscopy and attributed to the spin coating process, which resulted in higher crosslinking density in the film, and molecular orientation in the radial direction. Moisture absorption studies revealed that the mechanical properties were affected by water, which exists in both the free and bonded form in the polymer and acts as a plasticizer. The effect of moisture was similar in both the single and multilayer films, but was higher for the latter due to multiple processing steps as well as the existence of higher percentage of epoxy polar groups.

  14. Influences of pretreatment and hard baking on the mechanical reliability of SU-8 microstructures

    International Nuclear Information System (INIS)

    Morikaku, Toshiyuki; Kaibara, Yoshinori; Inoue, Shozo; Namazu, Takahiro; Inoue, Masatoshi; Miura, Takuya; Suzuki, Takaaki; Oohira, Fumikazu

    2013-01-01

    In this paper, the influences of pretreatment and hard baking on the mechanical characteristics of SU-8 microstructures are described. Four types of samples with different combinations of O 2 plasma ashing, primer coating and hard baking were prepared for shear strength tests and uniaxial tensile tests. Specially developed shear test equipment was used to experimentally measure the shear adhesion strength of SU-8 micro posts on a glass substrate. The adhesiveness was strengthened by hard baking at 200 °C for 60 min, whereas other pretreatment processes hardly affected the strength. The pretreatment and hard baking effects on the adhesive strength were compared with those on the fracture strength measured by uniaxial tensile testing. There were no influences of O 2 plasma ashing on both the strengths, and primer coating affected only tensile strength. The primer coating effect as well as the hard baking effect on stress relaxation phenomena in uniaxial tension was observed as well. Fourier transform infrared spectroscopy demonstrated that surface degradation and epoxide-ring opening polymerization would have given rise to the primer coating effect and the hard baking effect on the mechanical characteristics, respectively. (paper)

  15. Influences of pretreatment and hard baking on the mechanical reliability of SU-8 microstructures

    Science.gov (United States)

    Morikaku, Toshiyuki; Kaibara, Yoshinori; Inoue, Masatoshi; Miura, Takuya; Suzuki, Takaaki; Oohira, Fumikazu; Inoue, Shozo; Namazu, Takahiro

    2013-10-01

    In this paper, the influences of pretreatment and hard baking on the mechanical characteristics of SU-8 microstructures are described. Four types of samples with different combinations of O2 plasma ashing, primer coating and hard baking were prepared for shear strength tests and uniaxial tensile tests. Specially developed shear test equipment was used to experimentally measure the shear adhesion strength of SU-8 micro posts on a glass substrate. The adhesiveness was strengthened by hard baking at 200 °C for 60 min, whereas other pretreatment processes hardly affected the strength. The pretreatment and hard baking effects on the adhesive strength were compared with those on the fracture strength measured by uniaxial tensile testing. There were no influences of O2 plasma ashing on both the strengths, and primer coating affected only tensile strength. The primer coating effect as well as the hard baking effect on stress relaxation phenomena in uniaxial tension was observed as well. Fourier transform infrared spectroscopy demonstrated that surface degradation and epoxide-ring opening polymerization would have given rise to the primer coating effect and the hard baking effect on the mechanical characteristics, respectively.

  16. Effect of size and moisture on the mechanical behavior of SU-8 thin films

    International Nuclear Information System (INIS)

    Robin, C J; Jonnalagadda, K N

    2016-01-01

    The mechanical properties of SU-8 were investigated in conjunction with size effect, mechanical anisotropy and moisture absorption. Uniaxial tensile experiments were conducted on SU-8 films of 500 nm and 2 μm thickness. A spin coating process was used to fabricate the films with one set from a single coat (single layer) and the others containing multiple coats (multilayer) with pre-baking in between. The stress versus strain response was obtained from in situ optical experiments and a digital image correlation method. Compared to single layer films, the multilayer films showed a significant increase in mechanical properties as well as in-plane anisotropy. This anisotropy was confirmed using Fourier transform infrared spectroscopy and attributed to the spin coating process, which resulted in higher crosslinking density in the film, and molecular orientation in the radial direction. Moisture absorption studies revealed that the mechanical properties were affected by water, which exists in both the free and bonded form in the polymer and acts as a plasticizer. The effect of moisture was similar in both the single and multilayer films, but was higher for the latter due to multiple processing steps as well as the existence of higher percentage of epoxy polar groups. (paper)

  17. Thermal and optical properties of sol-gel and SU-8 resists

    Science.gov (United States)

    Suzuki, Toshiyuki; Morikawa, Junko; Hashimoto, Toshimasa; Buividas, Ričardas; Gervinskas, Gediminas; Paipulas, Domas; Malinauskas, Mangirdas; Mizeikis, Vygantas; Juodkazis, Saulius

    2012-03-01

    We report on a combined differential scanning calorimetric (DSC) and Raman scattering study of thermal polymerization of sol-gel organic-inorganic SZ2080 and SU-8 resists. In SZ2080, endothermic peak at 95°C signify drying of the resist and justifies the required pre-bake at around 100°C for 1-2 h for the best performance during femtosecond (fs-)direct laser writing. A strong exothermic peak at 140°C (under 2 K/min heating rate) completes polymerization of the resist. It is revealed that 1wt% of photoinitiators change Raman scattering intensity of SZ2080 and can contribute efficiently to heating and cross-linking of photo-polymers. In the case of SU-8, a 65°C DSC feature related to solvent evaporation was observed. The strongest changes in Raman spectrum occurs at a narrow 895 cm-1 band which is linked to polymerization. Raman scattering taken during DSC revealed spectral changes following the polymerization; an applicability of this method for monitoring photopolymerization induced by ultra-fast laser sources and feasibility of a laser-modulated calorimetry is discussed.

  18. Inkjet Printing of High Aspect Ratio Superparamagnetic SU-8 Microstructures with Preferential Magnetic Directions

    Directory of Open Access Journals (Sweden)

    Loïc Jacot-Descombes

    2014-08-01

    Full Text Available Structuring SU-8 based superparamagnetic polymer composite (SPMPC containing Fe3O4 nanoparticles by photolithography is limited in thickness due to light absorption by the nanoparticles. Hence, obtaining thicker structures requires alternative processing techniques. This paper presents a method based on inkjet printing and thermal curing for the fabrication of much thicker hemispherical microstructures of SPMPC. The microstructures are fabricated by inkjet printing the nanoparticle-doped SU-8 onto flat substrates functionalized to reduce the surface energy and thus the wetting. The thickness and the aspect ratio of the printed structures are further increased by printing the composite onto substrates with confinement pedestals. Fully crosslinked microstructures with a thickness up to 88.8 μm and edge angle of 112° ± 4° are obtained. Manipulation of the microstructures by an external field is enabled by creating lines of densely aggregated nanoparticles inside the composite. To this end, the printed microstructures are placed within an external magnetic field directly before crosslinking inducing the aggregation of dense Fe3O4 nanoparticle lines with in-plane and out-of-plane directions.

  19. Dielectric properties of ligand-modified gold nanoparticle/SU-8 photopolymer based nanocomposites

    Energy Technology Data Exchange (ETDEWEB)

    Toor, Anju, E-mail: atoor@berkeley.edu [Department of Mechanical Engineering, University of California, Berkeley, CA 94720 (United States); So, Hongyun, E-mail: hyso@berkeley.edu [Department of Mechanical Engineering, University of California, Berkeley, CA 94720 (United States); Pisano, Albert P. [Department of Mechanical Engineering, University of California, Berkeley, CA 94720 (United States); Department of Mechanical and Aerospace Engineering, University of California, San Diego, CA 92093 (United States)

    2017-08-31

    Highlights: • Ligand-modified gold NP/SU-8 nanocomposites were synthesized and demonstrated. • Particle agglomeration and dispersion were characterized with different NPs concentration. • Nanocomposites showed higher average dielectric permittivity compared to SU-8 only. • Relatively lower dielectric loss (average 0.09 at 1 kHz) was achieved with 10 % w/w NPs. - Abstract: This article reports the enhanced dielectric properties of a photodefinable polymer nanocomposite material containing sub–10 nm coated metal nanoparticles (NPs). The surface morphology of the synthesized dodecanethiol-functionalized gold NPs was characterized using the transmission electron microscopy (TEM). We investigated the particle agglomeration and dispersion during the various stages of the nanocomposite synthesis using TEM. Physical properties such as dielectric permittivity and dielectric loss were measured experimentally. The dependence of the dielectric permittivity and loss tangent on the particle concentration, and frequency was studied. Nanocomposite films showed an approximately three times enhancement in average dielectric constant over the polymer base value and an average dielectric loss of 0.09 at 1 kHz, at a filler loading of 10% w/w.

  20. Print-to-pattern dry film photoresist lithography

    International Nuclear Information System (INIS)

    Garland, Shaun P; Murphy, Terrence M Jr; Pan, Tingrui

    2014-01-01

    Here we present facile microfabrication processes, referred to as print-to-pattern dry film photoresist (DFP) lithography, that utilize the combined advantages of wax printing and DFP to produce micropatterned substrates with high resolution over a large surface area in a non-cleanroom setting. The print-to-pattern methods can be performed in an out-of-cleanroom environment making microfabrication much more accessible to minimally equipped laboratories. Two different approaches employing either wax photomasks or wax etchmasks from a solid ink desktop printer have been demonstrated that allow the DFP to be processed in a negative tone or positive tone fashion, respectively, with resolutions of 100 µm. The effect of wax melting on resolution and as a bonding material was also characterized. In addition, solid ink printers have the capacity to pattern large areas with high resolution, which was demonstrated by stacking DFP layers in a 50 mm × 50 mm woven pattern with 1 mm features. By using an office printer to generate the masking patterns, the mask designs can be easily altered in a graphic user interface to enable rapid prototyping. (technical note)

  1. PMMA to SU-8 Bonding for Polymer Based Lab-on-a-chip Systems with Integrated Optics

    DEFF Research Database (Denmark)

    Olsen, Brian Bilenberg; Nielsen, Theodor; Nilsson, Daniel

    2003-01-01

    An adhesive bonding technique for wafer-level sealing of SU-8 based lab-on-a-chip microsystems with integrated optical components is presented. Microfluidic channels and optical components, e.g. waveguides, are fabricated in cross-linked SU-8 and sealed with a Pyrex glass substrate by means...... strength of 16 MPa is achieved at bonding temperatures between 110 oC and 120oC, at a bonding force of 2000 N on a 4-inch wafer. The optical propagation loss of multi-mode 10ym (thickness)x 30ym (width)SU-8 waveguides is measured. The propagation loss in PMMA bonded waveguide struc-tures is more than 5 d......B/cm lower, at wavelengths between 600nm and 900 nm, than in similar structures bonded by an intermediate layer of SU-8. Furthermore 950K PMMA shows no tendency to flow into the bonded structures during bonding because of its high viscosity....

  2. SU-8 Cantilevers for Bio/chemical Sensing; Fabrication, Characterisation and Development of Novel Read-out Methods

    Directory of Open Access Journals (Sweden)

    Anja Boisen

    2008-03-01

    Full Text Available Here, we present the activities within our research group over the last five yearswith cantilevers fabricated in the polymer SU-8. We believe that SU-8 is an interestingpolymer for fabrication of cantilevers for bio/chemical sensing due to its simple processingand low Young’s modulus. We show examples of different integrated read-out methodsand their characterisation. We also show that SU-8 cantilevers have a reduced sensitivity tochanges in the environmental temperature and pH of the buffer solution. Moreover, weshow that the SU-8 cantilever surface can be functionalised directly with receptormolecules for analyte detection, thereby avoiding gold-thiol chemistry.

  3. A two-step sealing-and-reinforcement SU8 bonding paradigm for the fabrication of shallow microchannels

    Science.gov (United States)

    Mehboudi, Aryan; Yeom, Junghoon

    2018-03-01

    Adhesive bonding is a key technique to create microfluidic devices when two separate substrates are used to form microchannels. Among many adhesives explored in microchannel fabrication, SU8 has been widely used as an adhesive layer for sealing the microchannel sidewalls. The majority of the available SU8-based bonding methods, however, suffer from the difficulties associated with sealing of two important types of the microchannel architecture: (1) shallow microchannels with small patterns on a large area, and (2) microchannels with ultra-low aspect ratios (e.g. 6 mm in width and 2~μ m in height). In this paper, a new bonding paradigm based upon the low-temperature and low-pressure SU8 bonding, consisting of two steps of sealing using a thin-SU8-coated PET film and bonding reinforcement using a SU8-coated glass slide, is proposed to resolve the aforementioned difficulties. Since it does not need complicated instruments such as a wafer bonding machine and a lamination device, the developed bonding paradigm is convenient and economical. We successfully demonstrate the compatibility of the proposed bonding paradigm with the two microchannel fabrication approaches based on the glass wet etching and the SU8 photo-lithography, where small microchannels with the innermost surfaces fully made of SU8 are obtained. A theoretical model is employed to better investigate the flow characteristics and the structural behavior of the microchannel including the PET film deformation, strain and von Mises stress distributions, bonding strength, etc. Moreover, we demonstrate the fabrication of the multi-height deep-shallow microchannel sidewalls and their sealing using the SU8-coated PET film. Finally, as a proof-of-concept device, a microfluidic filter consisting of the double-height deep-shallow microchannel is fabricated for separation of 3 µm and 10 µm particles.

  4. Simulation of a low frequency Z-axis SU-8 accelerometer in coventorware and MEMS+

    KAUST Repository

    Carreno, Armando Arpys Arevalo

    2013-04-01

    This paper presents the simulation of a z-axis SU-8 capacitive accelerometer. The study consists of a modal analysis of the modeled accelerometer, a study relating capacitance to acceleration, capacitance to deflection, an effective spring constant calculation, and a comparison of results achieved using CoventorWare® ANALYZER™ and MEMS+®. A fabricated energy harvester design from [1] was used for modeling and simulation in this study, with a four spring attachment of a 650μm×650μm; ×110μm proof mass of 4.542×10-8 kg. At rest, the spacing between electrodes is 4μm along the z-axis, and at 1.5g acceleration, there is 1.9μm spacing between electrodes, at which point pull in occurs for a 1V voltage. © 2013 IEEE.

  5. Bi-directional triplexer with butterfly MMI coupler using SU-8 polymer waveguides

    Science.gov (United States)

    Mareš, David; Jeřábek, Vítězslav; Prajzler, Václav

    2015-01-01

    We report about a design of a bi-directional planar optical multiplex/demultiplex filter (triplexer) for the optical part of planar hybrid WDM bi-directional transceiver in fiber-to-the-home (FTTH) PON applications. The triplex lightwave circuit is based on the Epoxy Novolak Resin SU-8 waveguides on the silica-on-silicon substrate with Polymethylmethacrylate cladding layer. The triplexer is comprised of a linear butterfly concept of multimode interference (MMI) coupler separating downstream optical signals of 1490 nm and 1550 nm. For the upstream channel of 1310 nm, an additional directional coupler (DC) is used to add optical signal of 1310 nm propagating in opposite direction. The optical triplexer was designed and optimized using beam propagation method. The insertion losses, crosstalk attenuation, and extinction ratio for all three inputs/outputs were investigated. The intended triplexer was designed using the parameters of the separated DC and MMI filter to approximate the idealized direct connection of both devices.

  6. The Morphology of Silver Layers on SU8 polymers prepared by Electroless Deposition

    Science.gov (United States)

    Dutta, Aniruddha; Yuan, Biao; Heinrich, Helge; Grabill, Chris; Williams, Henry; Kuebler, Stephen; Bhattacharya, Aniket

    2010-03-01

    Silver was deposited onto the functionalized surface of polymeric SU-8 where gold nanoparticles (Au-NPs) act as nucleation sites using electroless metallization chemistry. Here we report on the evolution of the nanoscale morphology of deposited Ag studied by Transmission Electron Microscopy (TEM). In TEM of sample cross sections correlations between the original gold and the silver nanoparticles were obtained while plan-view TEM results showed the distribution of nanoparticles on the surface. Scanning TEM with a high-angle annular dark field detector was used to obtain atomic number contrast. The morphology of the deposited Ag was controlled through the presence and absence of gum Arabic. The thickness and height fluctuations of the Ag layer were determined as a function of time and a statistical analysis of the growth process was conducted for the initial deposition periods.

  7. Analytical techniques for mechanistic characterization of EUV photoresists

    Science.gov (United States)

    Grzeskowiak, Steven; Narasimhan, Amrit; Murphy, Michael; Ackerman, Christian; Kaminsky, Jake; Brainard, Robert L.; Denbeaux, Greg

    2017-03-01

    Extreme ultraviolet (EUV, 13.5 nm) lithography is the prospective technology for high volume manufacturing by the microelectronics industry. Significant strides towards achieving adequate EUV source power and availability have been made recently, but a limited rate of improvement in photoresist performance still delays the implementation of EUV. Many fundamental questions remain to be answered about the exposure mechanisms of even the relatively well understood chemically amplified EUV photoresists. Moreover, several groups around the world are developing revolutionary metal-based resists whose EUV exposure mechanisms are even less understood. Here, we describe several evaluation techniques to help elucidate mechanistic details of EUV exposure mechanisms of chemically amplified and metal-based resists. EUV absorption coefficients are determined experimentally by measuring the transmission through a resist coated on a silicon nitride membrane. Photochemistry can be evaluated by monitoring small outgassing reaction products to provide insight into photoacid generator or metal-based resist reactivity. Spectroscopic techniques such as thin-film Fourier transform infrared (FTIR) spectroscopy can measure the chemical state of a photoresist system pre- and post-EUV exposure. Additionally, electrolysis can be used to study the interaction between photoresist components and low energy electrons. Collectively, these techniques improve our current understanding of photomechanisms for several EUV photoresist systems, which is needed to develop new, better performing materials needed for high volume manufacturing.

  8. SU-8 Based MEMS Process with Two Metal Layers using α-Si as a Sacrificial Material

    KAUST Repository

    Ramadan, Khaled S.

    2012-04-01

    Polymer based microelectromechanical systems (MEMS) micromachining is finding more interest in research and applications. This is due to its low cost and less time processing compared with silicon MEMS. SU-8 is a photo-patternable polymer that is used as a structural layer for MEMS and microfluidic devices. In addition to being processed with low cost, it is a biocompatible material with good mechanical properties. Also, amorphous silicon (α-Si) has found use as a sacrificial layer in silicon MEMS applications. α-Si can be deposited at large thicknesses for MEMS applications and also can be released in a dry method using XeF2 which can solve stiction problems related to MEMS applications. In this thesis, an SU-8 MEMS process is developed using amorphous silicon (α-Si) as a sacrificial layer. Electrostatic actuation and sensing is used in many MEMS applications. SU-8 is a dielectric material which limits its direct use in electrostatic actuation. This thesis provides a MEMS process with two conductive metal electrodes that can be used for out-of-plane electrostatic applications like MEMS switches and variable capacitors. The process provides the fabrication of dimples that can be conductive or non-conductive to facilitate more flexibility for MEMS designers. This SU-8 process can fabricate SU-8 MEMS structures of a single layer of two different thicknesses. Process parameters were tuned for two sets of thicknesses which are thin (5-10μm) and thick (130μm). Chevron bent-beam structures and different suspended beams (cantilevers and bridges) were fabricated to characterize the SU-8 process through extracting the density, Young’s Modulus and the Coefficient of Thermal Expansion (CTE) of SU-8. Also, the process was tested and used as an educational tool through which different MEMS structures were fabricated including MEMS switches, variable capacitors and thermal actuators.

  9. RAFT technology for the production of advanced photoresist polymers

    Science.gov (United States)

    Sheehan, Michael T.; Farnham, William B.; Okazaki, Hiroshi; Sounik, James R.; Clark, George

    2008-03-01

    Reversible Addition Fragmentation Chain Transfer (RAFT) technology has been developed for use in producing high yield low polydispersity (PD) polymers for many applications. RAFT technology is being used to produce low PD polymers and to allow control of the polymer architecture. A variety of polymers are being synthesized for use in advanced photoresists using this technique. By varying the RAFT reagent used we can modulate the system reactivity of the RAFT reagent and optimize it for use in acrylate or methacrylate monomer systems (193 and 193i photoresist polymers) or for use in styrenic monomer systems (248 nm photoresist polymers) to achieve PD as low as 1.05. RAFT polymerization technology also allows us to produce block copolymers using a wide variety of monomers. These block copolymers have been shown to be useful in self assembly polymer applications to produce unique and very small feature sizes. The mutual compatibilities of all the components within a single layer 193 photoresist are very important in order to achieve low LWR and low defect count. The advent of immersion imaging demands an additional element of protection at the solid/liquid interface. We have used RAFT technology to produce block copolymers comprising a random "resist" block with composition and size based on conventional dry photoresist materials, and a "low surface energy" block for use in 193i lithography. The relative block lengths and compositions may be varied to tune solution behavior, surface energy, contact angles, and solubility in developer. The use of this technique will be explored to produce polymers used in hydrophobic single layer resists as well as additives compatible with the main photoresist polymer.

  10. Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism

    KAUST Repository

    Kryask, Marie; Trikeriotis, Markos; Ouyang, Christine; Chakrabarty, Sovik; Giannelis, Emmanuel P.; Ober, Christopher K.

    2013-01-01

    compared to other standard photoresists. The current study aims at investigating and establishing the underlying mechanism for dual tone patterning of these nanoparticle photoresist systems. Infrared spectroscopy and UV absorbance studies supported by mass

  11. Development of an SU-8 MEMS process with two metal electrodes using amorphous silicon as a sacrificial material

    KAUST Repository

    Ramadan, Khaled S.

    2013-02-08

    This work presents an SU-8 surface micromachining process using amorphous silicon as a sacrificial material, which also incorporates two metal layers for electrical excitation. SU-8 is a photo-patternable polymer that is used as a structural layer for MEMS and microfluidic applications due to its mechanical properties, biocompatibility and low cost. Amorphous silicon is used as a sacrificial layer in MEMS applications because it can be deposited in large thicknesses, and can be released in a dry method using XeF2, which alleviates release-based stiction problems related to MEMS applications. In this work, an SU-8 MEMS process was developed using ;-Si as a sacrificial layer. Two conductive metal electrodes were integrated in this process to allow out-of-plane electrostatic actuation for applications like MEMS switches and variable capacitors. In order to facilitate more flexibility for MEMS designers, the process can fabricate dimples that can be conductive or nonconductive. Additionally, this SU-8 process can fabricate SU-8 MEMS structures of a single layer of two different thicknesses. Process parameters were optimized for two sets of thicknesses: thin (5-10 m) and thick (130 m). The process was tested fabricating MEMS switches, capacitors and thermal actuators. © 2013 IOP Publishing Ltd.

  12. Aqueous-based thick photoresist removal for bumping applications

    Science.gov (United States)

    Moore, John C.; Brewer, Alex J.; Law, Alman; Pettit, Jared M.

    2015-03-01

    Cleaning processes account for over 25% of processing in microelectronic manufacturing [1], suggesting electronics to be one of the most chemical intensive markets in commerce. Industry roadmaps exist to reduce chemical exposure, usage, and waste [2]. Companies are encouraged to create a safer working environment, or green factory, and ultimately become certified similar to LEED in the building industry [3]. A significant step in this direction is the integration of aqueous-based photoresist (PR) strippers which eliminate regulatory risks and cut costs by over 50%. One of the largest organic solvent usages is based upon thick PR removal during bumping processes [4-6]. Using market projections and the benefits of recycling, it is estimated that over 1,000 metric tons (mt) of residuals originating from bumping processes are incinerated or sent to a landfill. Aqueous-based stripping would eliminate this disposal while also reducing the daily risks to workers and added permitting costs. Positive-tone PR dissolves in aqueous strippers while negative-tone systems are lifted-off from the substrate, bumps, pillars, and redistribution layers (RDL). While the wafers are further processed and rinsed, the lifted-off PR is pumped from the tank, collected onto a filter, and periodically back-flushed to the trash. The PR solids become a non-hazardous plastic waste while the liquids are mixed with the developer stream, neutralized, filtered, and in most cases, disposed to the sewer. Regardless of PR thickness, removal processes may be tuned to perform in <15min, performing at rates nearly 10X faster than solvents with higher bath lives. A balanced formula is safe for metals, dielectrics, and may be customized to any fab.

  13. Photolithography of thick photoresist coating for electrically controlled liquid crystal photonic bandgap fibre devices

    DEFF Research Database (Denmark)

    Wei, Lei; Khomtchenko, Elena; Alkeskjold, Thomas Tanggaard

    2009-01-01

    Thick photoresist coating for electrode patterning in an anisotropically etched V-groove is investigated for electrically controlled liquid crystal photonic bandgap fibre devices. The photoresist step coverage at the convex corners is compared with and without soft baking after photoresist spin...

  14. Distortion of 3D SU8 photonic structures fabricated by four-beam holographic lithography withumbrella configuration.

    Science.gov (United States)

    Zhu, Xuelian; Xu, Yongan; Yang, Shu

    2007-12-10

    We present a quantitative study of the distortion from a threeterm diamond-like structure fabricated in SU8 polymer by four-beam holographic lithography. In the study of the refraction effect, theory suggests that the lattice in SU8 should be elongated in the [111] direction but have no distortion in the (111) plane, and each triangular-like hole array in the (111) plane would rotate by ~30 degrees away from that in air. Our experiments agree with the prediction on the periodicity in the (111) plane and the rotation due to refraction effect, however, we find that the film shrinkage during lithographic process has nearly compensated the predicted elongation in the [111] direction. In study of photonic bandgap (PBG) properties of silicon photonic crystals templated by the SU8 structure, we find that the distortion has decreased quality of PBG.

  15. Development of 3D out-of-plane SU-8 microlenses using modified micromolding in capillaries (MIMIC) technology

    Science.gov (United States)

    Llobera, A.; Wilke, R.; Johnson, D. W.; Büttgenbach, S.

    2006-04-01

    This paper describes a modification of the standard MIMIC technology, solving its main drawbacks, to define arrays of spherical or ellipsoidal microlenses. Perfectly symmetrical meniscuses have been obtained by using a XP SU-8 NO-2 layer beneath the PDMS mold. Moreover, the photostructurable properties of this polymer allow obtaining self-alignment structures for adequate fiber optics positioning. Microchannels ended with these meniscuses have been filled with standard SU-8 to obtain 3D microlenses. Agreement between theory and experimental results allows confirming the validity of the proposed technology.

  16. An SU-8-based microprobe with a nanostructured surface enhances neuronal cell attachment and growth

    Science.gov (United States)

    Kim, Eunhee; Kim, Jin-Young; Choi, Hongsoo

    2017-12-01

    Microprobes are used to repair neuronal injury by recording electrical signals from neuronal cells around the surface of the device. Following implantation into the brain, the immune response results in formation of scar tissue around the microprobe. However, neurons must be in close proximity to the microprobe to enable signal recording. A common reason for failure of microprobes is impaired signal recording due to scar tissue, which is not related to the microprobe itself. Therefore, the device-cell interface must be improved to increase the number of neurons in contact with the surface. In this study, we developed nanostructured SU-8 microprobes to support neuronal growth. Nanostructures of 200 nm diameter and depth were applied to the surface of microprobes, and the attachment and neurite outgrowth of PC12 cells on the microprobes were evaluated. Neuronal attachment and neurite outgrowth on the nanostructured microprobes were significantly greater than those on non-nanostructured microprobes. The enhanced neuronal attachment and neurite outgrowth on the nanostructured microprobes occurred in the absence of an adhesive coating, such as poly- l-lysine, and so may be useful for implantable devices for long-term use. Therefore, nanostructured microprobes can be implanted without adhesive coating, which can cause problems in vivo over the long term.

  17. Fermion unification model based on the intrinsic SU(8 symmetry of a generalized Dirac equation

    Directory of Open Access Journals (Sweden)

    Eckart eMarsch

    2015-10-01

    Full Text Available A natural generalization of the original Dirac spinor into a multi-component spinor is achieved, which corresponds to the single lepton and the three quarks of the first family of the standard model of elementary particle physics. Different fermions result from similarity transformations of the Dirac equation, but apparently there can be no more fermions according to the maximal multiplicity revealed in this study. Rotations in the fermion state space are achieved by the unitary generators of the U(1 and the SU(3 groups, corresponding to quantum electrodynamics (QED based on electric charge and chromodynamics (QCD based on colour charge. In addition to hypercharge the dual degree of freedom of hyperspin emerges, which occurs due to the duplicity implied by the two related (Weyl and Dirac representations of the Dirac equation. This yields the SU(2 symmetry of the weak interaction, which can be married to U(1 to generate the unified electroweak interaction as in the standard model. Therefore, the symmetry group encompassing all the three groups mentioned above is SU(8, which can accommodate and unify the observed eight basic stable fermions.

  18. MEMS flexible artificial basilar membrane fabricated from piezoelectric aluminum nitride on an SU-8 substrate

    International Nuclear Information System (INIS)

    Jang, Jongmoon; Choi, Hongsoo; Jang, Jeong Hun

    2017-01-01

    In this paper, we present a flexible artificial basilar membrane (FABM) that mimics the passive mechanical frequency selectivity of the basilar membrane. The FABM is composed of a cantilever array made of piezoelectric aluminum nitride (AlN) on an SU-8 substrate. We analyzed the orientations of the AlN crystals using scanning electron microscopy and x-ray diffraction. The AIN crystals are oriented in the c -axis (0 0 2) plane and effective piezoelectric coefficient was measured as 3.52 pm V −1 . To characterize the frequency selectivity of the FABM, mechanical displacements were measured using a scanning laser Doppler vibrometer. When electrical and acoustic stimuli were applied, the measured resonance frequencies were in the ranges of 663.0–2369 Hz and 659.4–2375 Hz, respectively. These results demonstrate that the mechanical frequency selectivity of this piezoelectric FABM is close to the human communication frequency range (300–3000 Hz), which is a vital feature of potential auditory prostheses. (paper)

  19. Single Mode SU8 Polymer Based Mach-Zehnder Interferometer for Bio-Sensing Application

    Science.gov (United States)

    Boiragi, Indrajit; Kundu, Sushanta; Makkar, Roshan; Chalapathi, Krishnamurthy

    2011-10-01

    This paper explains the influence of different parameters to the sensitivity of an optical waveguide Mach-Zehnder Interferometer (MZI) for real time detection of biomolecules. The sensing principle is based on the interaction of evanescence field with the biomolecules that get immobilized on sensing arm. The sensitivity has been calculated by varying the sensing window length, wavelength and concentration of bio-analyte. The maximum attainable sensitivity for the preferred design is the order of 10-8 RIU at 840 nm wavelength with a sensing window length of 1cm. All the simulation work has been carried out with Opti-BPMCAD for the optimization of MZI device parameters. The SU8 polymers are used as a core and clad material to fabricate the waveguide. The refractive index of cladding layer is optimized by varying the curing temperature for a fixed time period and the achieved index difference between core and clad is Δn = 0.0151. The fabricated MZI device has been characterized with LASER beam profiler at 840 nm wavelength. This study demonstrates the effectiveness of the different parameter to the sensitivity of a single mode optical waveguide Mach-Zehnder Interferometer for bio-sensing application.

  20. Thin film free-standing PEDOT:PSS/SU8 bilayer microactuators

    International Nuclear Information System (INIS)

    Taccola, S; Greco, F; Mazzolai, B; Mattoli, V; Jager, E W H

    2013-01-01

    Several smart active materials have been proposed and tested for the development of microactuators. Among these, conjugated polymers are of great interest because miniaturization improves their electrochemical properties, such as increasing the speed and stress output of microactuators, with respect to large-scale actuators. Recently we developed a novel fabrication process to obtain robust free-standing conductive ultra-thin films made of the conjugated polymer poly(3, 4-ethylenedioxythiophene) doped with the polyanion poly(styrenesulfonate) (PEDOT:PSS). These conductive free-standing nanofilms, with thicknesses ranging between a few tens to several hundreds of nm, allow the realisation of new all polymer microactuators using facile microfabrication methods. Here, we report a novel processing method for manufacturing all polymer electrochemical microactuators. We fabricated and patterned free-standing PEDOT:PSS/SU8 bilayer microactuators in the form of microfingers of a variety of lengths using adapted microfabrication procedures. By imposing electrochemical oxidation/reduction cycles on the PEDOT:PSS we were able to demonstrate reversible actuation of the microactuators resulting in bending of the microfingers. A number of possible applications can be envisaged for these small, soft actuators, such as microrobotics and cell manipulation. (technical note)

  1. Study of functional viability of SU-8-based microneedles for neural applications

    International Nuclear Information System (INIS)

    Fernández, Luis J; Altuna, Ane; Tijero, Maria; Vilares, Roman; Berganzo, Javier; Blanco, F J; Gabriel, Gemma; Villa, Rosa; Rodríguez, Manuel J; Batlle, Montse

    2009-01-01

    This paper presents the design, fabrication, packaging and first test results of SU-8-based microneedles for neural applications. By the use of photolithography, sputtering and bonding techniques, polymer needles with integrated microchannels and electrodes have been successfully fabricated. The use of photolithography for the patterning of the fluidic channel integrated in the needle allows the design of multiple outlet ports at the needle tip, minimizing the possibility of being blocked by the tissue. Furthermore, the flexibility of the polymer reduces the risk of fracture and tissue damage once the needle is inserted, while it is still rigid enough to allow a perfect insertion into the neural tissue. Fluidic and electric characterization of the microneedles has shown their viability for drug delivery and monitoring in neural applications. First drug delivery tests in ex vivo tissue demonstrated the functional viability of the needle to deliver drugs to precise points. Furthermore, in vivo experiments have demonstrated lower associated damages during insertion than those by stereotaxic standard needles

  2. Photoresist removal using gaseous sulfur trioxide cleaning technology

    Science.gov (United States)

    Del Puppo, Helene; Bocian, Paul B.; Waleh, Ahmad

    1999-06-01

    A novel cleaning method for removing photoresists and organic polymers from semiconductor wafers is described. This non-plasma method uses anhydrous sulfur trioxide gas in a two-step process, during which, the substrate is first exposed to SO3 vapor at relatively low temperatures and then is rinsed with de-ionized water. The process is radically different from conventional plasma-ashing methods in that the photoresist is not etched or removed during the exposure to SO3. Rather, the removal of the modified photoresist takes place during the subsequent DI-water rinse step. The SO3 process completely removes photoresist and polymer residues in many post-etch applications. Additional advantages of the process are absence of halogen gases and elimination of the need for other solvents and wet chemicals. The process also enjoys a very low cost of ownership and has minimal environmental impact. The SEM and SIMS surface analysis results are presented to show the effectiveness of gaseous SO3 process after polysilicon, metal an oxide etch applications. The effects of both chlorine- and fluorine-based plasma chemistries on resist removal are described.

  3. Photoresist thin-film effects on alignment process capability

    Science.gov (United States)

    Flores, Gary E.; Flack, Warren W.

    1993-08-01

    Two photoresists were selected for alignment characterization based on their dissimilar coating properties and observed differences on alignment capability. The materials are Dynachem OFPR-800 and Shipley System 8. Both photoresists were examined on two challenging alignment levels in a submicron CMOS process, a nitride level and a planarized second level metal. An Ultratech Stepper model 1500 which features a darkfield alignment system with a broadband green light for alignment signal detection was used for this project. Initially, statistically designed linear screening experiments were performed to examine six process factors for each photoresist: viscosity, spin acceleration, spin speed, spin time, softbake time, and softbake temperature. Using the results derived from the screening experiments, a more thorough examination of the statistically significant process factors was performed. A full quadratic experimental design was conducted to examine viscosity, spin speed, and spin time coating properties on alignment. This included a characterization of both intra and inter wafer alignment control and alignment process capability. Insight to the different alignment behavior is analyzed in terms of photoresist material properties and the physical nature of the alignment detection system.

  4. Development of an SU-8 MEMS process with two metal electrodes using amorphous silicon as a sacrificial material

    KAUST Repository

    Ramadan, Khaled S.; Nasr, Tarek Adel Hosny; Foulds, Ian G.

    2013-01-01

    method using XeF2, which alleviates release-based stiction problems related to MEMS applications. In this work, an SU-8 MEMS process was developed using ;-Si as a sacrificial layer. Two conductive metal electrodes were integrated in this process to allow

  5. SU-8 Based MEMS Process with Two Metal Layers using α-Si as a Sacrificial Material

    KAUST Repository

    Ramadan, Khaled S.

    2012-01-01

    MEMS applications. α-Si can be deposited at large thicknesses for MEMS applications and also can be released in a dry method using XeF2 which can solve stiction problems related to MEMS applications. In this thesis, an SU-8 MEMS process is developed

  6. Electrodeposition properties of modified cational epoxy resin-type photoresist

    International Nuclear Information System (INIS)

    Yong He; Yunlong Zhang; Feipeng Wu; Miaozhen Li; Erjian Wang

    1999-01-01

    Multi-component cationic epoxy and acrylic resin system for ED photoresist was used in this work, since they can provide better storage stability for ED emulsion and better physical and chemical properties of deposited film than one-component system. The cationic main resin (AE) was prepared from amine modified epoxy resins and then treated with acetic acid. The amination degree was controlled as required. The synthetic procedure of cationic main resins is described in scheme I. The ED photoresist (AME) is composed of cationic main resin (AE) and nonionic multifunctional acrylic crosslinkers (PETA), in combination with suitable photo-initiator. They can easily be dispersed in deionized water to form a stable ED emulsion. The exposed part of deposited film upon UV irradiation occurs crosslinking to produce an insoluble semi-penetrating network and the unexposed part remains good solubility in the acidic water solution. It is readily utilized for fabrication of fine micropattern. The electrodeposition are carried out on Cu plate at room temperature. To evaluate the electrodeposition properties of ED photoresist (AME), the different influences are examined

  7. Chemical metallization of KMPR photoresist polymer in aqueous solutions

    Energy Technology Data Exchange (ETDEWEB)

    Zeb, Gul [MiQro Innovation Collaborative Centre (C2MI), 45, boul. de l' Aéroport, Bromont, QC, J2L 1S8 (Canada); Mining & Materials Engineering, McGill University, 3610,University Street, Montreal, QC, H3A 0C5 (Canada); Duong, Xuan Truong [Department of Mechanical Engineering, Ecole polytechnique de Montréal, Montréal, QC, H3C 3T5 (Canada); Thai Nguyen University of Technology, 3-2 Street, Thai Nguyen City (Viet Nam); Vu, Ngoc Pi; Phan, Quang The; Nguyen, Duc Tuong; Ly, Viet Anh [Thai Nguyen University of Technology, 3-2 Street, Thai Nguyen City (Viet Nam); Salimy, Siamak [ePeer Review LLC, 145 Pine Haven Shores Rd, Suite 1000-X, Shelburne, VT 05482 (United States); Le, Xuan Tuan, E-mail: xuantuan.le@teledyne.com [MiQro Innovation Collaborative Centre (C2MI), 45, boul. de l' Aéroport, Bromont, QC, J2L 1S8 (Canada); Thai Nguyen University of Technology, 3-2 Street, Thai Nguyen City (Viet Nam)

    2017-06-15

    Highlights: • Electroless deposition of Ni-B film on KMPR photoresist polymer insulator with excellent adhesion has been achieved. • This metallization has been carried out in aqueous solutions at low temperature. • Polyamine palladium complexes grafts serve as seeds for the electroless plating on KMPR. • This electroless metallization process is simple, industrially feasible, chromium-free and environment-friendly. - Abstract: While conventional methods for preparing thin films of metals and metallic alloys on insulating substrates in the field of microelectromechanical systems (MEMS) include vapor deposition techniques, we demonstrate here that electroless deposition can be considered as an alternate efficient approach to metallize the surface of insulating substrates, such as KMPR epoxy photoresist polymer. In comparison with the physical and chemical vapor deposition methods, which are well-established for metallization of photoresist polymers, our electroless nickel plating requires only immersing the substrates into aqueous solutions in open air at low temperatures. Thin films of nickel alloy have been deposited electrolessly on KMPR surface, through a cost-effective and environmental chromium-free process, mediated through direct grafting of amine palladium complexes in aqueous medium. This covalent organic coating provides excellent adhesion between KMPR and the nickel film and allows better control of the palladium catalyst content. Covalent grafting and characterization of the deposited nickel film have been carried out by means of Fourier-transform infrared spectroscopy, scanning electron microscopy, energy-dispersive X-ray spectroscopy and X-ray photoelectron spectroscopy techniques.

  8. Comparison of three different scales techniques for the dynamic mechanical characterization of two polymers (PDMS and SU8)

    Science.gov (United States)

    Le Rouzic, J.; Delobelle, P.; Vairac, P.; Cretin, B.

    2009-10-01

    In this article the dynamic mechanical characterization of PDMS and SU8 resin using dynamic mechanical analysis, nanoindentation and the scanning microdeformation microscope have been presented. The methods are hereby explained, extended for viscoelastic behaviours, and their compatibility underlined. The storage and loss moduli of these polymers over a wide range of frequencies (from 0.01 Hz to somekHz) have been measured. These techniques are shown fairly matching and the two different viscoelastic behaviours of these two polymers have been exhibited. Indeed, PDMS shows moduli which still increase at 5kHz whereas SU8 ones decrease much sooner. From a material point of view, the Havriliak and Negami model to estimate instantaneous, relaxed moduli and time constant of these materials has been identified.

  9. An isotropic suspension system for a biaxial accelerometer using electroplated thick metal with a HAR SU-8 mold

    International Nuclear Information System (INIS)

    Lee, Jin Seung; Lee, Seung S

    2008-01-01

    In this paper, a novel approach is developed to design an isotropic suspension system using thick metal freestanding micro-structures combining bulk micro-machining with electroplating based on a HAR SU-8 mold. An omega-shape isotropic suspension system composed of circular curved beams that have free switching of imaginary boundary conditions is proposed. This novel isotropic suspension design is not affected by geometric dimensional parameters and always achieves matching stiffness along the principle axes of elasticity. Using the finite element method, the isotropic suspension system was compared with an S-shaped meandering suspension system. In order to realize the suggested isotropic suspension system, a cost-effective fabrication process using electroplating with the SU-8 mold was developed to avoid expensive equipment and materials such as deep reactive-ion etching (DRIE) or a silicon-on-insulator (SOI) wafer. The fabricated isotropic suspension system was verified by electromagnetic actuation experiments. Finally, a biaxial accelerometer with isotropic suspension system was realized and tested using a vibration generator system. The proposed isotropic suspension system and the modified surface micro-machining technique based on electroplating with an SU-8 mold can contribute towards minimizing the system size, simplifying the system configuration, reducing the system price of and facilitating mass production of various types of low-cost sensors and actuators

  10. Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism

    KAUST Repository

    Kryask, Marie

    2013-01-01

    Hybrid nanoparticle photoresists and their patterning using DUV, EUV, 193 nm lithography and e-beam lithography has been investigated and reported earlier. The nanoparticles have demonstrated very high EUV sensitivity and significant etch resistance compared to other standard photoresists. The current study aims at investigating and establishing the underlying mechanism for dual tone patterning of these nanoparticle photoresist systems. Infrared spectroscopy and UV absorbance studies supported by mass loss and dissolution studies support the current model. © 2013SPST.

  11. Replication of optical microlens arrays using photoresist coated molds

    DEFF Research Database (Denmark)

    Chakrabarti, Maumita; Dam-Hansen, Carsten; Stubager, Jørgen

    2016-01-01

    A cost reduced method of producing injection molding tools is reported and demonstrated for the fabrication of optical microlens arrays. A standard computer-numerical-control (CNC) milling machine was used to make a rough mold in steel. Surface treatment of the steel mold by spray coating...... with photoresist is used to smooth the mold surface providing good optical quality. The tool and process are demonstrated for the fabrication of an ø50 mm beam homogenizer for a color mixing LED light engine. The acceptance angle of the microlens array is optimized, in order to maximize the optical efficiency from...

  12. Chemical metallization of KMPR photoresist polymer in aqueous solutions

    Science.gov (United States)

    Zeb, Gul; Duong, Xuan Truong; Vu, Ngoc Pi; Phan, Quang The; Nguyen, Duc Tuong; Ly, Viet Anh; Salimy, Siamak; Le, Xuan Tuan

    2017-06-01

    While conventional methods for preparing thin films of metals and metallic alloys on insulating substrates in the field of microelectromechanical systems (MEMS) include vapor deposition techniques, we demonstrate here that electroless deposition can be considered as an alternate efficient approach to metallize the surface of insulating substrates, such as KMPR epoxy photoresist polymer. In comparison with the physical and chemical vapor deposition methods, which are well-established for metallization of photoresist polymers, our electroless nickel plating requires only immersing the substrates into aqueous solutions in open air at low temperatures. Thin films of nickel alloy have been deposited electrolessly on KMPR surface, through a cost-effective and environmental chromium-free process, mediated through direct grafting of amine palladium complexes in aqueous medium. This covalent organic coating provides excellent adhesion between KMPR and the nickel film and allows better control of the palladium catalyst content. Covalent grafting and characterization of the deposited nickel film have been carried out by means of Fourier-transform infrared spectroscopy, scanning electron microscopy, energy-dispersive X-ray spectroscopy and X-ray photoelectron spectroscopy techniques.

  13. Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

    DEFF Research Database (Denmark)

    Wei, Lei; Khomtchenko, Elena; Alkeskjold, Thomas Tanggaard

    2009-01-01

    Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.......Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss....

  14. Microchannel-connected SU-8 honeycombs by single-step projection photolithography for positioning cells on silicon oxide nanopillar arrays

    International Nuclear Information System (INIS)

    Larramendy, Florian; Paul, Oliver; Blatche, Marie Charline; Mazenq, Laurent; Laborde, Adrian; Temple-Boyer, Pierre

    2015-01-01

    We report on the fabrication, functionalization and testing of SU-8 microstructures for cell culture and positioning over large areas. The microstructure consists of a honeycomb arrangement of cell containers interconnected by microchannels and centered on nanopillar arrays designed for promoting cell positioning. The containers have been dimensioned to trap single cells and, with a height of 50 µm, prevent cells from escaping. The structures are fabricated using a single ultraviolet photolithography exposure with focus depth in the lower part of the SU-8 resist. With optimized process parameters, microchannels of various aspect ratios are thus produced. The cell containers and microchannels serve for the organization of axonal growth between neurons. The roughly 2 µm-high and 500 nm-wide nanopillars are made of silicon oxide structured by deep reactive ion etching. In future work, beyond their cell positioning purpose, the nanopillars could be functionalized as sensors. The proof of concept of the novel microstructure for organized cell culture is given by the successful growth of interconnected PC12 cells. Promoted by the honeycomb geometry, a dense network of interconnections between the cells has formed and the intended intimate contact of cells with the nanopillar arrays was observed by scanning electron microscopy. This proves the potential of these new devices as tools for the controlled cell growth in an interconnected container system with well-defined 3D geometry. (paper)

  15. Nonlinear numerical analysis and experimental testing for an electrothermal SU-8 microgripper with reduced out-of-plane displacement

    Science.gov (United States)

    Voicu, Rodica-Cristina; Zandi, Muaiyd Al; Müller, Raluca; Wang, Changhai

    2017-11-01

    This paper reports the results of numerical nonlinear electro-thermo-mechanical analysis and experimental testing of a polymeric microgripper designed using electrothermal actuators. The simulation work was carried out using a finite element method (FEM) and a commercial software (Coventorware 2014). The biocompatible SU-8 polymer was used as structural material for the fabrication of the microgripper. The metallic micro-heater was encapsulated in the polymeric actuation structures of the microgripper to reduce the undesirable out-of-plane displacement of the microgripper tips, and to electrically isolate the micro-heater, and to reduce the mechanical stress as well as to improve the thermal efficiency. The electro- thermo-mechanical analysis of the actuator considers the nonlinear temperature-dependent properties of the SU-8 polymer and the gold thin film layers used for the micro-heater fabrication. An optical characterisation of the microgripper based on an image tracking approach shows the thermal response and the good repeatability. The average deflection is ~11 µm for an actuation current of ~17 mA. The experimentally obtained tip deflection and the heater temperature at different currents are both shown to be in good agreement with the nonlinear electro-thermo-mechanical simulation results. Finally, we demonstrate the capability of the microgripper by capture and manipulation of cotton fibres.

  16. Decisive factors affecting plasma resistance and roughness formation in ArF photoresist

    Energy Technology Data Exchange (ETDEWEB)

    Jinnai, Butsurin; Uesugi, Takuji; Koyama, Koji; Samukawa, Seiji [Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan); Kato, Keisuke; Yasuda, Atsushi; Maeda, Shinichi [Yokohama Research Laboratories, Mitsubishi Rayon Co., Ltd, 10-1 Daikoku-cho, Tsurumi-ku, Yokohama 230-0053 (Japan); Momose, Hikaru, E-mail: samukawa@ifs.tohoku.ac.j [Corporate Research Laboratories, Mitsubishi Rayon Co., Ltd, 2-1 Miyuki-cho, Otake, Hiroshima 739-0693 (Japan)

    2010-10-06

    Low plasma resistance and roughness formation in an ArF photoresist are serious issues in plasma processes. To resolve these issues, we investigated several factors that affect the roughness formation and plasma resistance in an ArF photoresist. We used our neutral beam process to categorize the effects of species from the plasma on the ArF photoresist into physical bombardment, chemical reactions and ultraviolet/vacuum ultraviolet (UV/VUV) radiation. The UV/VUV radiation drastically increased the etching rates of the ArF photoresist films, and, in contrast, chemical reactions increased the formation of surface roughness. FTIR analysis indicated that the UV/VUV radiation preferentially dissociates C-H bonds in the ArF photoresist, rather than C=O bonds, because of the dissociation energies of the bonds. This indicated that the etching rates of the ArF photoresist are determined by the UV/VUV radiation because this radiation can break C-H bonds, which account for the majority of structures in the ArF photoresist. In contrast, FTIR analysis showed that chemical species such as radicals and ions were likely to react with C=O bonds, in particular C=O bonds in the lactone groups of the ArF photoresist, due to the structural and electronic effects of the lactone groups. As a result, the etching rates of the ArF photoresist can vary in different bond structures, leading to increased surface roughness in the ArF photoresist.

  17. Organic Field-Effect Transistors Based on a Liquid-Crystalline Polymeric Semiconductor using SU-8 Gate Dielectrics on Flexible Substrates

    Science.gov (United States)

    Tetzner, Kornelius; Bose, Indranil R.; Bock, Karlheinz

    2014-01-01

    In this work, the insulating properties of poly(4-vinylphenol) (PVP) and SU-8 (MicroChem, Westborough, MA, USA) dielectrics are analyzed and compared with each other. We further investigate the performance behavior of organic field-effect transistors based on a semiconducting liquid-crystal polymer (LCP) using both dielectric materials and evaluate the results regarding the processability. Due to the lower process temperature needed for the SU-8 deposition, the realization of organic transistors on flexible substrates is demonstrated showing comparable charge carrier mobilities to devices using PVP on glass. In addition, a µ-dispensing procedure of the LCP on SU-8 is presented, improving the switching behavior of the organic transistors, and the promising stability data of the SU-8/LCP stack are verified after storing the structures for 60 days in ambient air showing negligible irreversible degradation of the organic semiconductor. PMID:28788243

  18. Organic Field-Effect Transistors Based on a Liquid-Crystalline Polymeric Semiconductor using SU-8 Gate Dielectrics onFlexible Substrates

    Directory of Open Access Journals (Sweden)

    Kornelius Tetzner

    2014-10-01

    Full Text Available In this work, the insulating properties of poly(4-vinylphenol (PVP and SU-8 (MicroChem, Westborough, MA, USA dielectrics are analyzed and compared with each other. We further investigate the performance behavior of organic field-effect transistors based on a semiconducting liquid-crystal polymer (LCP using both dielectric materials and evaluate the results regarding the processability. Due to the lower process temperature needed for the SU-8 deposition, the realization of organic transistors on flexible substrates is demonstrated showing comparable charge carrier mobilities to devices using PVP on glass. In addition, a µ-dispensing procedure of the LCP on SU-8 is presented, improving the switching behavior of the organic transistors, and the promising stability data of the SU-8/LCP stack are verified after storing the structures for 60 days in ambient air showing negligible irreversible degradation of the organic semiconductor.

  19. Organic Field-Effect Transistors Based on a Liquid-Crystalline Polymeric Semiconductor using SU-8 Gate Dielectrics onFlexible Substrates.

    Science.gov (United States)

    Tetzner, Kornelius; Bose, Indranil R; Bock, Karlheinz

    2014-10-29

    In this work, the insulating properties of poly(4-vinylphenol) (PVP) and SU-8 (MicroChem, Westborough, MA, USA) dielectrics are analyzed and compared with each other. We further investigate the performance behavior of organic field-effect transistors based on a semiconducting liquid-crystal polymer (LCP) using both dielectric materials and evaluate the results regarding the processability. Due to the lower process temperature needed for the SU-8 deposition, the realization of organic transistors on flexible substrates is demonstrated showing comparable charge carrier mobilities to devices using PVP on glass. In addition, a µ-dispensing procedure of the LCP on SU-8 is presented, improving the switching behavior of the organic transistors, and the promising stability data of the SU-8/LCP stack are verified after storing the structures for 60 days in ambient air showing negligible irreversible degradation of the organic semiconductor.

  20. Fluorine atom subsurface diffusion and reaction in photoresist

    International Nuclear Information System (INIS)

    Greer, Frank; Fraser, D.; Coburn, J.W.; Graves, David B.

    2003-01-01

    Kinetic studies of fluorine and deuterium atoms interacting with an OiR 897 10i i-line photoresist (PR) are reported. All experiments were conducted at room temperature. Films of this PR were coated on quartz-crystal microbalance (QCM) substrates and exposed to alternating fluxes of these atoms in a high vacuum apparatus. Mass changes of the PR were observed in situ and in real time during the atom beam exposures using the QCM. A molecular-beam sampled differentially pumped quadrupole mass spectrometer (QMS) was used to measure the species desorbing from the PR surface during the F and D atom exposures. During the D atom exposures, hydrogen abstraction and etching of the PR was observed, but no DF formation was detected. However, during the F atom exposures, the major species observed to desorb from the surface was DF, formed from fluorine abstraction of deuterium from the photoresist. No evidence of film etching or fluorine self-abstraction was observed. The film mass increased during F atom exposure, evidently due to the replacement of D by F in the film. The rate of DF formation and mass uptake were both characterized by the same kinetics: An initially rapid step declining exponentially with time (e -t/τ ), followed by a much slower step following inverse square root of time (t -1/2 ) kinetics. The initially rapid step was interpreted as surface abstraction of D by F to form DF, which desorbs, with subsequent F impacting the surface inserted into surface C dangling bonds. The slower step was interpreted as F atoms diffusing into the fluorinated photoresist, forming DF at the boundary of the fluorinated carbon layer. The t -1/2 kinetics of this step are interpreted to indicate that F diffusion through the fluorinated carbon layer is much slower than the rate of F abstraction of D to form DF, or the rate of F insertion into the carbon dangling bonds left behind after DF formation. A diffusion-limited growth model was formulated, and the model parameters are

  1. Proton beam writing on PMMA and SU-8 films as a tool for development of micro-structures for organic electronics

    Energy Technology Data Exchange (ETDEWEB)

    Sarkar, Mihir, E-mail: mihirs@iitk.ac.in [Department of Physics, Indian Institute of Technology Kanpur, Kanpur 208016 (India); Shukla, Neeraj; Banerji, Nobin [Department of Physics, Indian Institute of Technology Kanpur, Kanpur 208016 (India); Mohapatra, Y.N. [Department of Physics, Indian Institute of Technology Kanpur, Kanpur 208016 (India); Materials Science Programme, Indian Institute of Technology Kanpur, Kanpur 208016 (India); Samtel Center for Display Technologies, Indian Institute of Technology Kanpur, Kanpur 208016 (India)

    2012-02-15

    Proton beam writing is a maskless lithographic technique for the fabrication of 3D micro and nano structures in polymers. The fabricated structures find application in micro fluidics, optics, biosensors, etc. We use proton beam writing for micro-patterning in polymers which will facilitate fabrication of test structures for micro-components of micro-fluidic devices, organic thin film transistors (OTFT) and organic light emitting diodes (OLED). In this paper we report fabrication of varying width micro channels in PMMA and SU-8 films used as positive and negative resists respectively. The patterns were written using 2 MeV proton beam focused down to around 1 micron. We have achieved clean periodic micro-channels of width varying from few micrometers to wider ones in both the resists. Being a mask less lithography it provides an efficient way of reducing turnaround time for test structures with several channel widths and patterns being conveniently written at the same development cycle. Possible applications of the patterned structures in OLED/TFT are discussed. Additional structures like checkered board are also fabricated. Optimized fluence for both the resist has been determined.

  2. Preparation of a novel ferrofluidic photoresist for two-photon photopolymerization technique

    International Nuclear Information System (INIS)

    Tian Ye; Lu Dongxiao; Jiang Haobo; Lin Xiaomei

    2012-01-01

    We present a novel route for the preparation of ferrofluidic photoresist compatible with two-photon photopolymerization (TPP). To get a homogeneous ferrofluidic photoresit, the compatibility of photoresist and magnetic materials has been improved. Monodispersed Fe 3 O 4 nanoparticles synthesized via thermal decomposition of iron precursor were stabilized by 6-(methacryloyloxy) hexanoic acid (a kind of acrylate-based monomer). A ferrofluidic photoresist was prepared by doping the modified Fe 3 O 4 nanoparticles in acrylate-based resin. In this way, the dispersibility of nanoparticles in photoresist was enhanced significantly. As a representative example, a precise magnetic micron-sized spring was created. In the test of the magnetic response, the sensitivity of magnetic microspring was improved remarkably due to the optimization of the ferrofluidic photoresist. When the intensity of external magnetic field reached a value of 1500 Gs, the deformation rate of the microspring would get to 2.25, indicating the compatibility of the ferrofluidic photoresist in microfabrication. - Highlights: ► A novel ferrofluid photoresist was developed for TPP fabrication. ► A micrometer-sized magnetic spring was successfully created. ► Performance of microsprings was highly improved due to the optimization of nanoparticles.

  3. Characterization of Line Nanopatterns on Positive Photoresist Produced by Scanning Near-Field Optical Microscope

    Directory of Open Access Journals (Sweden)

    Sadegh Mehdi Aghaei

    2015-01-01

    Full Text Available Line nanopatterns are produced on the positive photoresist by scanning near-field optical microscope (SNOM. A laser diode with a wavelength of 450 nm and a power of 250 mW as the light source and an aluminum coated nanoprobe with a 70 nm aperture at the tip apex have been employed. A neutral density filter has been used to control the exposure power of the photoresist. It is found that the changes induced by light in the photoresist can be detected by in situ shear force microscopy (ShFM, before the development of the photoresist. Scanning electron microscope (SEM images of the developed photoresist have been used to optimize the scanning speed and the power required for exposure, in order to minimize the final line width. It is shown that nanometric lines with a minimum width of 33 nm can be achieved with a scanning speed of 75 µm/s and a laser power of 113 mW. It is also revealed that the overexposure of the photoresist by continuous wave laser generated heat can be prevented by means of proper photoresist selection. In addition, the effects of multiple exposures of nanopatterns on their width and depth are investigated.

  4. A Novel, Aqueous Surface Treatment To Thermally Stabilize High Resolution Positive Photoresist Images*

    Science.gov (United States)

    Grunwald, John J.; Spencer, Allen C.

    1986-07-01

    The paper describes a new approach to thermally stabilize the already imaged profile of high resolution positive photoresists such as ULTRAMAC" PR-914. ***XD-4000, an aqueous emulsion of a blend of fluorine-bearing compounds is spun on top of the developed, positive photoresist-imaged wafer, and baked. This allows the photoresist to withstand temperatures up to at least 175 deg. C. while essentially maintaining vertical edge profiles. Also, adverse effects of "outgassing" in harsh environments, ie., plasma and ion implant are greatly minimized by allowing the high resolution imaged photoresist to be post-baked at "elevated" temperatures. Another type of product that accomplishes the same effect is ***XD-4005, an aqueous emulsion of a high temperature-resistant polymer. While the exact mechanism is yet to be identified, it is postulated that absorption of the "polymeric" species into the "skin" of the imaged resist forms a temperature resistant "envelope", thereby allowing high resolution photoresists to also serve in a "high temperature" mode, without reticulation, or other adverse effects due to thermal degradation. SEM's are presented showing imaged ULTRAMAC" PR-914 and ULTRAMAC" **EPA-914 geometries coated with XD-4000 or XD-4005 and followed by plasma etched oxide,polysilicon and aluminum. Selectivity ratios are compared with and without the novel treatment and are shown to be significantly better with the treatment. The surface-treated photoresist for thermal resistance remains easily strippable in solvent-based or plasma media, unlike photoresists that have undergone "PRIST" or other gaseous thermal stabilization methods.

  5. Heterogeneous integration of thin film compound semiconductor lasers and SU8 waveguides on SiO2/Si

    Science.gov (United States)

    Palit, Sabarni; Kirch, Jeremy; Mawst, Luke; Kuech, Thomas; Jokerst, Nan Marie

    2010-02-01

    We present the heterogeneous integration of a 3.8 μm thick InGaAs/GaAs edge emitting laser that was metal-metal bonded to SiO2/Si and end-fire coupled into a 2.8 μm thick tapered SU8 polymer waveguide integrated on the same substrate. The system was driven in pulsed mode and the waveguide output was captured on an IR imaging array to characterize the mode. The waveguide output was also coupled into a multimode fiber, and into an optical head and spectrum analyzer, indicating lasing at ~997 nm and a threshold current density of 250 A/cm2.

  6. Fabrication and characterization of microcavity lasers in rhodamine B doped SU8 using high energy proton beam

    Science.gov (United States)

    Venugopal Rao, S.; Bettiol, A. A.; Vishnubhatla, K. C.; Bhaktha, S. N. B.; Narayana Rao, D.; Watt, F.

    2007-03-01

    The authors present their results on the characterization of individual dye-doped microcavity polymer lasers fabricated using a high energy proton beam. The lasers were fabricated in rhodamine B doped SU8 resist with a single exposure step followed by chemical processing. The resulting trapezoidal shaped cavities had dimensions of ˜250×250μm2. Physical characterization of these structures was performed using a scanning electron microscope while the optical characterization was carried out by recording the emission subsequent to pumping the lasers with 532nm, 6 nanosecond pulses. The authors observed intense, narrow emission near 624nm with the best emission linewidth full width at half maximum of ˜9nm and a threshold ˜150μJ/mm2.

  7. The influence of hard-baking temperature applied for SU8 sensor layer on the sensitivity of capacitive chemical sensor

    Science.gov (United States)

    Klanjšek Gunde, Marta; Hauptman, Nina; Maček, Marijan; Kunaver, Matjaž

    2009-06-01

    SU8, the near-UV photosensitive epoxy-based polymer was used as a sensor layer in the capacitive chemical sensor, ready for integration with a generic double-metal CMOS technology. It was observed that the response of the sensor slowly increases with the temperature applied in hard-baking process as long as it remains below 300°C. At this temperature the response of the sensor abruptly increases and becomes almost threefold. It was shown that fully crosslinked structure of the sensor layer becomes opened and disordered when the sensor is hard-baked at temperatures between 300°C and 320°C, that is, still well below the degradation temperature of the polymer. These changes in chemical structure were analyzed by Fourier-transform infrared spectroscopy. The temperature-dependent changes of the sensor layer structure enable one to prepare a combination of capacitive chemical sensors with good discrimination between some volatile organic compounds.

  8. Characterization of channel waveguides and tunable microlasers in SU8 doped with rhodamine B fabricated using proton beam writing

    International Nuclear Information System (INIS)

    Rao, S Venugopal; Bettiol, A A; Watt, F

    2008-01-01

    We present our results on the fabrication and characterization of buried channel waveguides and tunable microlasers in SU8 doped with rhodamine B achieved using direct writing with a 2.0 MeV proton beam. The channel waveguides, fabricated in single exposure, had an optical propagation loss of -1 at 532 nm measured using the scattering technique while the microlasers with dimensions of 250 x 250 μm 2 had a threshold of ∼150 μJ mm -2 when pumped with 532 nm nanosecond pulses. The emitted wavelength from the microlasers was tunable to an extent of ∼15 nm with increasing pump intensity and different pumping angles. The advantages of such micro-photonic components for the realization of a lab-on-a-chip device are discussed briefly. (fast track communication)

  9. Contact printed masks for 3D microfabrication in negative resists

    DEFF Research Database (Denmark)

    Häfliger, Daniel; Boisen, Anja

    2005-01-01

    We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded into the ......We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded...... into the negative resist to protect buried material from UV-exposure. Unlike direct evaporation-deposition of a mask onto the SU-8, printing avoids high stress and radiation, thus preventing resist wrinkling and prepolymerization. We demonstrate effective monolithic fabrication of soft, 4-μm thick and 100-μm long...

  10. Paper Microzone Plates as Analytical Tools for Studying Enzyme Stability: A Case Study on the Stabilization of Horseradish Peroxidase Using Trehalose and SU-8 Epoxy Novolac Resin.

    Science.gov (United States)

    Ganaja, Kirsten A; Chaplan, Cory A; Zhang, Jingyi; Martinez, Nathaniel W; Martinez, Andres W

    2017-05-16

    Paper microzone plates in combination with a noncontact liquid handling robot were demonstrated as tools for studying the stability of enzymes stored on paper. The effect of trehalose and SU-8 epoxy novolac resin (SU-8) on the stability of horseradish peroxidase (HRP) was studied in both a short-term experiment, where the activity of various concentrations of HRP dried on paper were measured after 1 h, and a long-term experiment, where the activity of a single concentration of HRP dried and stored on paper was monitored for 61 days. SU-8 was found to stabilize HRP up to 35 times more than trehalose in the short-term experiment for comparable concentrations of the two reagents, and a 1% SU-8 solution was found to stabilize HRP approximately 2 times more than a 34% trehalose solution in both short- and long-term experiments. The results suggest that SU-8 is a promising candidate for use as an enzyme-stabilizing reagent for paper-based diagnostic devices and that the short-term experiment could be used to quickly evaluate the capacity of various reagents for stabilizing enzymes to identify and characterize new enzyme-stabilizing reagents.

  11. Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning

    KAUST Repository

    Li, Li; Chakrabarty, Souvik; Spyrou, Konstantinos; Ober, Christopher K.; Giannelis, Emmanuel P.

    2015-01-01

    © 2015 American Chemical Society. Hf-based hybrid photoresist materials with three different organic ligands were prepared by a sol-gel-based method, and their patterning mechanism was investigated in detail. All hybrid nanoparticle resists

  12. Effect of thiol group on the curing process of alkaline developable photo-resists

    International Nuclear Information System (INIS)

    Hidetaka Oka; Masaki Ohwa; Hisatoshi Kura

    1999-01-01

    Photosensitivity of a conventional radical photo-initiator in an alkaline developable photoresist is boosted by substitution with a thiol group. Evidence is presented that the thiol group acts via chain transfer mechanism

  13. Pyrolyzed Photoresist Electrodes for Integration in Microfluidic Chips for Transmitter Detection from Biological Cells

    DEFF Research Database (Denmark)

    Larsen, Simon Tylsgaard; Argyraki, Aikaterini; Amato, Letizia

    2013-01-01

    In this study, we show how pyrolyzed photoresist carbon electrodes can be used for amperometric detection of potassium-induced transmitter release from large groups of neuronal PC 12 cells. This opens the way for the use of carbon film electrodes in microfabricated devices for neurochemical drug ...... by the difference in photoresist viscosity. By adding a soft bake step to the fabrication procedure, the flatness of pyrolyzed AZ 5214 electrodes could be improved which would facilitate their integration in microfluidic chip devices....

  14. A three-dimensional microstructuring technique exploiting the positive photoresist property

    International Nuclear Information System (INIS)

    Hirai, Yoshikazu; Sugano, Koji; Tsuchiya, Toshiyuki; Tabata, Osamu

    2010-01-01

    The present paper describes a three-dimensional (3D) thick-photoresist microstructuring technique that exploits the effect of exposure wavelength on dissolution rate distributions in a thick-film diazonaphthoquinone (DNQ) photoresist. In fabricating 3D microstructure with specific applications, it is important to control the spatial dissolution rate distribution in the photoresist layer, since the lithographic performance for 3D microstructuring is largely determined by the details of the dissolution property. To achieve this goal, the effect of exposure wavelength on dissolution rate distributions was applied for 3D microstructuring. The parametric experimental results demonstrated (1) the advantages of the fabrication technique for 3D microstructuring and (2) the necessity of a dedicated simulation approach based on the measured thick-photoresist property for further verification. Thus, a simple and practical photolithography simulation model that makes use of the Fresnel diffraction theory and an empirically characterized DNQ photoresist property was adopted. Simulations revealed good quantitative agreement between the photoresist development profiles of the standard photolithography and the moving-mask UV lithography process. The simulation and experimental results conclude that the g-line (λ = 436 nm) process can reduce the dimensional limitation or complexity of the photolithography process for the 3D microstructuring which leads to nanoscale microstructuring.

  15. Hydrogenated amorphous silicon photoresists for HgCdTe patterning

    Energy Technology Data Exchange (ETDEWEB)

    Hollingsworth, R.E.; DeHart, C.; Wang, L.; Dinan, J.H.; Johnson, J.N.

    1997-07-01

    A process to use a hydrogenated amorphous silicon (a-Si:H) film as a dry photoresist mask for plasma etching of HgCdTe has been demonstrated. The a-Si:H films were deposited using standard plasma enhanced chemical vapor deposition with pure silane as the source gas. X-ray photoelectron spectra show that virtually no oxide grows on the surface of an a-Si:H film after 3 hours in air, indicating that it is hydrogen passivated. Ultraviolet light frees hydrogen from the surface and enhances the oxide growth rate. A pattern of 60 micron square pixels was transferred from a contact mask to the surface of an a-Si:H film by ultraviolet enhanced oxidation in air. For the conditions used, the oxide thickness was 0.5--1.0 nm. Hydrogen plasmas were used to develop this pattern by removing the unexposed regions of the film. A hydrogen plasma etch selectivity between oxide and a-Si:H of greater than 500:1 allows patterns as thick as 700 nm to be generated with this very thin oxide. These patterns were transferred into HgCdTe by etching in an electron cyclotron resonance plasma. An etch selectivity between a-Si:H and HgCdTe of greater than 4:1 was observed after etching 2,500 nm into the HgCdTe. All of the steps are compatible with processing in vacuum.

  16. Fabrication of a roller type PDMS stamp using SU-8 concave molds and its application for roll contact printing

    International Nuclear Information System (INIS)

    Park, Jongho; Kim, Beomjoon

    2016-01-01

    Continuous fabrication of micropatterns at low-cost is attracting attention in various applications within industrial fields. To meet such demands, we have demonstrated a roll contact printing technique, using roller type polydimethylsiloxane (PDMS) stamps with roll-to-flat and roll-to-roll stages. Roller type PDMS stamps for roll contact printing were fabricated using a custom-made metal support and SU-8 microstructures fabricated on concave substrates as a mold. The molding/casting method which we developed here provided faster and easier fabrication than conventional methods for roller type stamps. Next, roll contact printing was performed using fabricated roller type PDMS stamps with roll-to-flat and roll-to-roll stages. Patterns with minimum widths of 3 μm and 2.1 μm were continuously fabricated for each stage, respectively. In addition, the relationship between applied pressures and dimensional changes of roll contact printed patterns was investigated. Finally, we confirmed that roll contact printing and the new fabrication method for roller stamps presented in this study demonstrated the feasibility for industrial applications. (paper)

  17. Quantitative approach for optimizing e-beam condition of photoresist inspection and measurement

    Science.gov (United States)

    Lin, Chia-Jen; Teng, Chia-Hao; Cheng, Po-Chung; Sato, Yoshishige; Huang, Shang-Chieh; Chen, Chu-En; Maruyama, Kotaro; Yamazaki, Yuichiro

    2018-03-01

    Severe process margin in advanced technology node of semiconductor device is controlled by e-beam metrology system and e-beam inspection system with scanning electron microscopy (SEM) image. By using SEM, larger area image with higher image quality is required to collect massive amount of data for metrology and to detect defect in a large area for inspection. Although photoresist is the one of the critical process in semiconductor device manufacturing, observing photoresist pattern by SEM image is crucial and troublesome especially in the case of large image. The charging effect by e-beam irradiation on photoresist pattern causes deterioration of image quality, and it affect CD variation on metrology system and causes difficulties to continue defect inspection in a long time for a large area. In this study, we established a quantitative approach for optimizing e-beam condition with "Die to Database" algorithm of NGR3500 on photoresist pattern to minimize charging effect. And we enhanced the performance of measurement and inspection on photoresist pattern by using optimized e-beam condition. NGR3500 is the geometry verification system based on "Die to Database" algorithm which compares SEM image with design data [1]. By comparing SEM image and design data, key performance indicator (KPI) of SEM image such as "Sharpness", "S/N", "Gray level variation in FOV", "Image shift" can be retrieved. These KPIs were analyzed with different e-beam conditions which consist of "Landing Energy", "Probe Current", "Scanning Speed" and "Scanning Method", and the best e-beam condition could be achieved with maximum image quality, maximum scanning speed and minimum image shift. On this quantitative approach of optimizing e-beam condition, we could observe dependency of SEM condition on photoresist charging. By using optimized e-beam condition, measurement could be continued on photoresist pattern over 24 hours stably. KPIs of SEM image proved image quality during measurement and

  18. Single mode solid state distributed feedback dye laser fabricated by grey scale electron beam lithography on dye doped SU-8 resist

    DEFF Research Database (Denmark)

    Balslev, Søren; Rasmussen, Torben; Shi, Peixiong

    2005-01-01

    We demonstrate grey scale electron beam lithography on functionalized SU-8 resist for fabrication of single mode solid state dye laser devices. The resist is doped with Rhodamine 6G perchlorate and the lasers are based on a first order Bragg grating distributed feedback resonator. The lasers...

  19. Photodefinable electro-optic polymer for high-speed modulators

    NARCIS (Netherlands)

    Balakrishnan, M.; Faccini, M.; Diemeer, Mart; Verboom, Willem; Driessen, A.; Reinhoudt, David; Leinse, Arne

    2006-01-01

    Direct waveguide definition of a negative photoresist (SU8) containing tricyanovinylidenediphenylaminobenzene (TCVDPA) as electro-optic (EO) chromophore, has been demonstrated for the first time. This was possible by utilising the chromophore low absorption window in the UV region allowing

  20. Microring resonator based modulator made by direct photodefinition of an electro-optic polymer

    NARCIS (Netherlands)

    Lam, Nghi Q.; Balakrishnan, M.; Faccini, M.; Diemeer, Mart; Klein, E.J.; Sengo, G.; Sengo, G.; Driessen, A.; Verboom, Willem; Reinhoudt, David

    2008-01-01

    A laterally coupled microring resonator was fabricated by direct photodefinition of negative photoresist SU8, containing tricyanovinylidenediphenylaminobenzene chromophore, by exploiting the low ultraviolet absorption window of this chromophore. The ring resonator was first photodefined by slight

  1. Enhanced Response Speed of ZnO Nanowire Photodetector by Coating with Photoresist

    Directory of Open Access Journals (Sweden)

    Xing Yang

    2016-01-01

    Full Text Available Spin-coating photoresist film on ZnO nanowire (NW was introduced into the fabrication procedure to improve photoresponse and recovery speed of a ZnO NW ultraviolet photoelectric detector. A ZnO NW was first assembled on prefabricated electrodes by dielectrophoresis. Then, photoresist was spin-coated on the nanowire. Finally, a metal layer was electrodeposited on the nanowire-electrode contacts. The response properties and I-V characteristics of ZnO NW photodetector were investigated by measuring the electrical current under different conditions. Measurement results demonstrated that the detector has an enhanced photoresponse and recovery speed after coating the nanowire with photoresist. The photoresponse and recovery characteristics of detectors with and without spin-coating were compared to demonstrate the effects of photoresist and the enhancement of response and recovery speed of the photodetector is ascribed to the reduced surface absorbed oxygen molecules and binding effect on the residual oxygen molecules after photoresist spin-coating. The results demonstrated that surface coating may be an effective and simple way to improve the response speed of the photoelectric device.

  2. Improving plasma resistance and lowering roughness in an ArF photoresist by adding a chemical reaction inhibitor

    International Nuclear Information System (INIS)

    Jinnai, Butsurin; Uesugi, Takuji; Koyama, Koji; Samukawa, Seiji; Kato, Keisuke; Yasuda, Atsushi; Maeda, Shinichi; Momose, Hikaru

    2010-01-01

    Major challenges associated with 193 nm lithography using an ArF photoresist are low plasma resistance and roughness formation in the ArF photoresist during plasma processes. We have previously found decisive factors affecting the plasma resistance and roughness formation in an ArF photoresist: plasma resistance is determined by UV/VUV radiation, and roughness formation is dominated by chemical reactions. In this study, based on our findings on the interaction between plasma radiation species and ArF photoresist polymers, we proposed an ArF photoresist with a chemical reaction inhibitor, which can trap reactive species from the plasma, and characterized the performances of the resultant ArF photoresist through neutral beam experiments. Hindered amine light stabilizers, i.e. 4-hydroxy-2,2,6,6-tetramethyl-1-piperidinyloxy (HO-TEMPO), were used as the chemical reaction inhibitor. Etching rates of the ArF photoresist films were not dependent on the HO-TEMPO content in the irradiations without chemical reactions or under UV/VUV radiation. However, in the irradiation with chemical reactions, the etching rates of the ArF photoresist films decreased as the HO-TEMPO content increased. In addition, the surface roughness decreased with the increase in the additive amount of chemical reaction inhibitor. According to FTIR analysis, a chemical reaction inhibitor can inhibit the chemical reactions in ArF photoresist films through plasma radicals. These results indicate that a chemical reaction inhibitor is effective against chemical reactions, resulting in improved plasma resistance and less roughness in an ArF photoresist. These results also support our suggested mechanism of plasma resistance and roughness formation in an ArF photoresist.

  3. Pyrolyzed Photoresist Carbon Electrodes for Trace Electroanalysis of Nickel(II

    Directory of Open Access Journals (Sweden)

    Ligia Maria Moretto

    2015-05-01

    Full Text Available Novel pyrolyzed photoresist carbon electrodes for electroanalytical applications have been produced by photolithographic technology followed by pyrolysis of the photoresist. A study of the determination of Ni(II dimethylglyoximate (Ni-DMG through adsorptive cathodic stripping voltammetry at an in situ bismuth-modified pyrolyzed photoresist electrode (Bi-PPCE is reported. The experimental conditions for the deposition of a bismuth film on the PPCE were optimized. The Bi-PPCE allowed the analysis of trace concentrations of Ni(II, even in the presence of Co(II, which is the main interference in this analysis, with cathodic stripping square wave voltammograms characterized by well-separated stripping peaks. The calculated limits of detection (LOD were 20 ng∙L−1 for Ni(II alone and 500 ng∙L−1 in the presence of Co(II. The optimized method was finally applied to the analysis of certified spring water (NIST1640a.

  4. Effect of heat treatment on the electrical resistance of photoresist as related to radioisotopic thermoelectric generator aging

    International Nuclear Information System (INIS)

    Johnson, R.T. Jr.

    1979-03-01

    Photoresist is used in electrical contact definition and processing in radioisotopic thermoelectric generators. Inadequate removal of material during processing could lead to electrical shorting when exposed to the high temperature use environment. This effect has been simulated through studies of the electrical resistance of thin layers of photoresist (Kodak Metal Etch Resist) on glass (Corning 7052) with tungsten electrodes. Results show that both the photoresist and the glass contribute to the resistance. The glass resistance decreases with increasing temperature and becomes significant at high temperatures. Annealing studies on the photoresist show that the resistance of the photoresist decreases by over five orders of magnitude upon annealing to 500 0 C, with a corresponding decrease in activation energy from 0.27 eV (350 0 C anneal) to 0.10 eV (500 0 C anneal). Time dependent decreases in resistance of the photoresist were also measured for up to 8 to 9 days during high temperature anneals. Some electrolytic transport of tungsten may occur through the photoresist at high temperatures. Results are compared with data on thermoelectric generators and show that photoresist could cause the electrical aging (voltage degradation) problem observed in some generators

  5. Conformal coating by photoresist of sharp corners of anisotropically etched through-holes in silicon

    DEFF Research Database (Denmark)

    Heschel, Matthias; Bouwstra, Siebe

    1997-01-01

    The authors describe a photoresist treatment yielding conformal coating of three-dimensional silicon structures. This even includes the sharp corners of through-holes obtained by anisotropic etching in (100)-silicon. Resist reflow from these corners is avoided by replacing the common baking...

  6. Degradation effects and Si-depth profiling in photoresists using ion beam analysis

    NARCIS (Netherlands)

    IJzendoorn, van L.J.; Schellekens, J.P.W.

    1989-01-01

    The reaction of silicon-containing vapour with a photoresist layer, as used in dry developable lithographic processes, was studied with Rutherford backscattering spectrometry (RBS). Degradation of the polymer layer was observed, but the total amount of incorporated Si was found to be constant during

  7. Demonstration of an N7 integrated fab process for metal oxide EUV photoresist

    Science.gov (United States)

    De Simone, Danilo; Mao, Ming; Kocsis, Michael; De Schepper, Peter; Lazzarino, Frederic; Vandenberghe, Geert; Stowers, Jason; Meyers, Stephen; Clark, Benjamin L.; Grenville, Andrew; Luong, Vinh; Yamashita, Fumiko; Parnell, Doni

    2016-03-01

    Inpria has developed a directly patternable metal oxide hard-mask as a robust, high-resolution photoresist for EUV lithography. In this paper we demonstrate the full integration of a baseline Inpria resist into an imec N7 BEOL block mask process module. We examine in detail both the lithography and etch patterning results. By leveraging the high differential etch resistance of metal oxide photoresists, we explore opportunities for process simplification and cost reduction. We review the imaging results from the imec N7 block mask patterns and its process windows as well as routes to maximize the process latitude, underlayer integration, etch transfer, cross sections, etch equipment integration from cross metal contamination standpoint and selective resist strip process. Finally, initial results from a higher sensitivity Inpria resist are also reported. A dose to size of 19 mJ/cm2 was achieved to print pillars as small as 21nm.

  8. Solubility studies of inorganic–organic hybrid nanoparticle photoresists with different surface functional groups

    KAUST Repository

    Li, Li

    2016-01-01

    © 2016 The Royal Society of Chemistry. The solubility behavior of Hf and Zr based hybrid nanoparticles with different surface ligands in different concentrations of photoacid generator as potential EUV photoresists was investigated in detail. The nanoparticles regardless of core or ligand chemistry have a hydrodynamic diameter of 2-3 nm and a very narrow size distribution in organic solvents. The Hansen solubility parameters for nanoparticles functionalized with IBA and 2MBA have the highest contribution from the dispersion interaction than those with tDMA and MAA, which show more polar character. The nanoparticles functionalized with unsaturated surface ligands showed more apparent solubility changes after exposure to DUV than those with saturated ones. The solubility differences after exposure are more pronounced for films containing a higher amount of photoacid generator. The work reported here provides material selection criteria and processing strategies for the design of high performance EUV photoresists.

  9. Advanced metal lift-off process using electron-beam flood exposure of single-layer photoresist

    Science.gov (United States)

    Minter, Jason P.; Ross, Matthew F.; Livesay, William R.; Wong, Selmer S.; Narcy, Mark E.; Marlowe, Trey

    1999-06-01

    In the manufacture of many types of integrated circuit and thin film devices, it is desirable to use a lift-of process for the metallization step to avoid manufacturing problems encountered when creating metal interconnect structures using plasma etch. These problems include both metal adhesion and plasma etch difficulties. Key to the success of the lift-off process is the creation of a retrograde or undercut profile in the photoresists before the metal deposition step. Until now, lift-off processing has relied on costly multi-layer photoresists schemes, image reversal, and non-repeatable photoresist processes to obtain the desired lift-off profiles in patterned photoresist. This paper present a simple, repeatable process for creating robust, user-defined lift-off profiles in single layer photoresist using a non-thermal electron beam flood exposure. For this investigation, lift-off profiles created using electron beam flood exposure of many popular photoresists were evaluated. Results of lift-off profiles created in positive tone AZ7209 and ip3250 are presented here.

  10. Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies

    Energy Technology Data Exchange (ETDEWEB)

    Škriniarová, J., E-mail: jaroslava.skriniarova@stuba.sk [Institute of Electronics and Photonics, Slovak University of Technology, Bratislava (Slovakia); Pudiš, D. [Department of Physics, University of Žilina, Žilina (Slovakia); Andok, R. [Department of E-Beam Lithography, Institute of Informatics, Slovak Academy of Sciences, Bratislava (Slovakia); Lettrichová, I. [Department of Physics, University of Žilina, Žilina (Slovakia); Uherek, F. [Institute of Electronics and Photonics, Slovak University of Technology, Bratislava (Slovakia)

    2017-02-15

    Highlights: • Applicability of the AZ 5214E photoresist for three different lithographies. • Useful for the fabrication of 1D and 2D periodic and irregular structures. • 2D structures with 260 nm period achieved by the laser interference lithography. • Structures with period below 500 nm achieved with the e-beam direct-write lithography. • Holes of 270 nm diameter made by the near-field scanning optical microscopy lithography. - Abstract: In this paper we show a comparison of chosen lithographies used for the AZ 5214E photoresist, which is normally UV sensitive but has also been investigated for its sensitivity to e-beam exposure. Three lithographies, the E-Beam Direct Write lithography (EBDW), laser Interference Lithography (IL) and the non-contact Near-field Scanning Optical Microscopy (NSOM) lithography, are discussed here and the results on exposed arrays of simple patterns are shown. With the EBDW and IL we achieved periods of the structures around half-micron, and we demonstrate attainability of dimensions smaller or comparable than usually achieved by a standard optical photolithography with the investigated photoresist. With the non-contact NSOM lithography structures with periods slightly above a micron were achieved.

  11. Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists

    International Nuclear Information System (INIS)

    Pargon, E.; Menguelti, K.; Martin, M.; Bazin, A.; Joubert, O.; Chaix-Pluchery, O.; Sourd, C.; Derrough, S.; Lill, T.

    2009-01-01

    In this article, we have performed detailed investigations of the 193 nm photoresist transformations after exposure to the so-called HBr and Ar plasma cure treatments using various characterization techniques (x-ray photoelectron spectroscopy, Fourier transformed infrared, Raman analyses, and ellipsometry). By using windows with different cutoff wavelengths patched on the photoresist film, the role of the plasma vacuum ultraviolet (VUV) light on the resist modifications is clearly outlined and distinguished from the role of radicals and ions from the plasma. The analyses reveal that both plasma cure treatments induce severe surface and bulk chemical modifications of the resist films. The synergistic effects of low energetic ion bombardment and VUV plasma light lead to surface graphitization or cross-linking (on the order of 10 nm), while the plasma VUV light (110-210 nm) is clearly identified as being responsible for ester and lactone group removal from the resist bulk. As the resist modification depth depends strongly on the wavelength penetration into the material, it is found that HBr plasma cure that emits near 160-170 nm can chemically modify the photoresist through its entire thickness (240 nm), while the impact of Ar plasmas emitting near 100 nm is more limited. In the case of HBr cure treatment, Raman and ellipsometry analyses reveal the formation of sp 2 carbon atoms in the resist bulk, certainly thanks to hydrogen diffusion through the resist film assisted by the VUV plasma light.

  12. Design and fabrication of an ac-electro-osmosis micropump with 3D high-aspect-ratio electrodes using only SU-8

    International Nuclear Information System (INIS)

    Rouabah, Hamza A; Morgan, Hywel; Green, Nicolas G; Park, Benjamin Y; Zaouk, Rabih B; Madou, Marc J

    2011-01-01

    Lab-on-a-chip devices require integrated pumping and fluid control in microchannels. A recently developed mechanism that can produce fluid flow is an integrated ac-electro-osmosis micropump. However, like most electrokinetic pumps, ac-electro-osmotic pumps are incapable of handling backpressure as the pumping force mechanism acts on the surface of the fluid rather than the bulk. This paper presents a novel 3D electrode structure designed to overcome this limitation. The electrodes are fabricated using carbon-MEMS technology based on the pyrolysis of the photo-patternable polymer SU-8. The novel ac-electro-osmosis micropump shows an increase in the flow velocity compared to planar electrodes.

  13. Optical Amplification at 1525 nm in BaYF5: 20% Yb3+, 2% Er3+ Nanocrystals Doped SU-8 Polymer Waveguide

    Directory of Open Access Journals (Sweden)

    Pengcheng Zhao

    2014-01-01

    Full Text Available We demonstrated optical amplification in BaYF5: 20% Yb3+, 2% Er3+ (BYF nanocrystals doped polymer waveguide. BYF nanocrystals with an average size of ∼13 nm were synthesized by a high-boiling solvent process. Intense 1.53 μm fluorescence was obtained in the nanocrystals under excitation at 980 nm. An optical polymer waveguide was fabricated by using BYF nanocrystals doped SU-8 polymer as the core material. A relative optical gain of ∼10.4 dB at 1525 nm was achieved in a 1.1 cm long waveguide for an input signal power of ∼0.09 mW and a pump power of ∼212 mW.

  14. Coleman-Weinberg symmetry breaking in SU(8) induced by a third rank antisymmetric tensor scalar field II: the fermion spectrum

    Science.gov (United States)

    Adler, Stephen L.

    2017-07-01

    We continue our study of Coleman-Weinberg symmetry breaking induced by a third rank antisymmetric tensor scalar, in the context of the SU(8) model (Adler 2014 Int. J. Mod. Phys. A 29 1450130) we proposed earlier. We focus in this paper on qualitative features that will determine whether the model can make contact with the observed particle spectrum. We discuss the mechanism for giving the spin \\frac{3}{2} field a mass by the BEH mechanism, and analyze the remaining massless spin \\frac{1}{2} fermions, the global chiral symmetries, and the running couplings after symmetry breaking. We note that the smallest gluon mass matrix eigenvalue has an eigenvector suggestive of U(1) B-L , and conjecture that the theory runs to an infrared fixed point at which there is a massless gluon with 3 to  -1 ratios in generator components. Assuming this, we discuss a mechanism for making contact with the standard model, based on a conjectured asymmetric breaking of Sp(4) to SU(2) subgroups, one of which is the electroweak SU(2), and the other of which is a ‘technicolor’ group that binds the original SU(8) model fermions, which play the role of ‘preons’, into composites. Quarks can emerge as 5 preon composites and leptons as 3 preon composites, with consequent stability of the proton against decay to a single lepton plus a meson. A composite Higgs boson can emerge as a two preon composite. Since anomaly matching for the relevant conserved global symmetry current is not obeyed by three fermion families, emergence of three composite families requires formation of a Goldstone boson with quantum numbers matching this current, which can be a light dark matter candidate.

  15. Acoustic-wave sensor for ambient monitoring of a photoresist-stripping agent

    Science.gov (United States)

    Pfeifer, K.B.; Hoyt, A.E.; Frye, G.C.

    1998-08-18

    The acoustic-wave sensor is disclosed. The acoustic-wave sensor is designed for ambient or vapor-phase monitoring of a photoresist-stripping agent such as N-methylpyrrolidinone (NMP), ethoxyethylpropionate (EEP) or the like. The acoustic-wave sensor comprises an acoustic-wave device such as a surface-acoustic-wave (SAW) device, a flexural-plate-wave (FPW) device, an acoustic-plate-mode (APM) device, or a thickness-shear-mode (TSM) device (also termed a quartz crystal microbalance or QCM) having a sensing region on a surface thereof. The sensing region includes a sensing film for sorbing a quantity of the photoresist-stripping agent, thereby altering or shifting a frequency of oscillation of an acoustic wave propagating through the sensing region for indicating an ambient concentration of the agent. According to preferred embodiments of the invention, the acoustic-wave device is a SAW device; and the sensing film comprises poly(vinylacetate), poly(N-vinylpyrrolidinone), or poly(vinylphenol). 3 figs.

  16. EUV patterning using CAR or MOX photoresist at low dose exposure for sub 36nm pitch

    Science.gov (United States)

    Thibaut, Sophie; Raley, Angélique; Lazarrino, Frederic; Mao, Ming; De Simone, Danilo; Piumi, Daniele; Barla, Kathy; Ko, Akiteru; Metz, Andrew; Kumar, Kaushik; Biolsi, Peter

    2018-04-01

    The semiconductor industry has been pushing the limits of scalability by combining 193nm immersion lithography with multi-patterning techniques for several years. Those integrations have been declined in a wide variety of options to lower their cost but retain their inherent variability and process complexity. EUV lithography offers a much desired path that allows for direct print of line and space at 36nm pitch and below and effectively addresses issues like cycle time, intra-level overlay and mask count costs associated with multi-patterning. However it also brings its own sets of challenges. One of the major barrier to high volume manufacturing implementation has been hitting the 250W power exposure required for adequate throughput [1]. Enabling patterning using a lower dose resist could help move us closer to the HVM throughput targets assuming required performance for roughness and pattern transfer can be met. As plasma etching is known to reduce line edge roughness on 193nm lithography printed features [2], we investigate in this paper the level of roughness that can be achieved on EUV photoresist exposed at a lower dose through etch process optimization into a typical back end of line film stack. We will study 16nm lines printed at 32 and 34nm pitch. MOX and CAR photoresist performance will be compared. We will review step by step etch chemistry development to reach adequate selectivity and roughness reduction to successfully pattern the target layer.

  17. Investigation of the air effect on the resonance frequency and damping of three small assembled structures using different adhesive materials (SU8 epoxy resin and compressed gold)

    International Nuclear Information System (INIS)

    Nouira, H; Foltête, E; Hirsinger, L; Ballandras, S

    2008-01-01

    There has been growing interest in recent years in the understanding of microsystems and the mechanical properties essential for their design. In this context, an experimental technique is proposed to characterize the structures of small dimensions composed of both silicon and lithium niobate and assembled using three different adhesive materials (SU8 (5 and 1 µm) and compressed gold) surrounded by various ambient air pressure levels. Dynamic tests were performed on three different structures used for the manufacturing of a harvesting energy microconverter. The assembled structure is mounted on a support and excited by a white noise signal via an electromagnetic shaker. The dynamic responses are recorded by a Doppler laser vibrometer and the modal parameters (obtained from the dynamic response) are identified in order to determine their evolution when the ambient air pressure inside the vacuum chamber is changed. A nonlinear modal identification is then performed. It is based on the logarithmic decrement method applied in the time–frequency domain using a wavelet transform of the time responses. The evolution of the equivalent modal frequencies and damping of the assembled structure versus time and vibration magnitude are identified for several pressure values ranging from a secondary vacuum to atmospheric pressure

  18. Silicon-depth profiling with Rutherford backscattering in photoresist layers; a study on the effects of degradation

    NARCIS (Netherlands)

    IJzendoorn, van L.J.; Schellekens, J.P.W.

    1989-01-01

    The reaction of a silicon-containing vapor with a photoresist layer, as used in some dry developable lithographic processes, was studied with Rutherford backscattering spectrometry. Degradation of the polymer layer under ion beam irradiation was observed, but it was found that this had no influence

  19. Tribo-functionalizing Si and SU8 materials by surface modification for application in MEMS/NEMS actuator-based devices

    International Nuclear Information System (INIS)

    Singh, R A; Satyanarayana, N; Sinha, S K; Kustandi, T S

    2011-01-01

    Micro/nano-electro-mechanical-systems (MEMS/NEMS) are miniaturized devices built at micro/nanoscales. At these scales, the surface/interfacial forces are extremely strong and they adversely affect the smooth operation and the useful operating lifetimes of such devices. When these forces manifest in severe forms, they lead to material removal and thereby reduce the wear durability of the devices. In this paper, we present a simple, yet robust, two-step surface modification method to significantly enhance the tribological performance of MEMS/NEMS materials. The two-step method involves oxygen plasma treatment of polymeric films and the application of a nanolubricant, namely perfluoropolyether. We apply the two-step method to the two most important MEMS/NEMS structural materials, namely silicon and SU8 polymer. On applying surface modification to these materials, their initial coefficient of friction reduces by ∼4-7 times and the steady-state coefficient of friction reduces by ∼2.5-3.5 times. Simultaneously, the wear durability of both the materials increases by >1000 times. The two-step method is time effective as each of the steps takes the time duration of approximately 1 min. It is also cost effective as the oxygen plasma treatment is a part of the MEMS/NEMS fabrication process. The two-step method can be readily and easily integrated into MEMS/NEMS fabrication processes. It is anticipated that this method will work for any kind of structural material from which MEMS/NEMS are or can be made.

  20. Tribo-functionalizing Si and SU8 materials by surface modification for application in MEMS/NEMS actuator-based devices

    Science.gov (United States)

    Singh, R. A.; Satyanarayana, N.; Kustandi, T. S.; Sinha, S. K.

    2011-01-01

    Micro/nano-electro-mechanical-systems (MEMS/NEMS) are miniaturized devices built at micro/nanoscales. At these scales, the surface/interfacial forces are extremely strong and they adversely affect the smooth operation and the useful operating lifetimes of such devices. When these forces manifest in severe forms, they lead to material removal and thereby reduce the wear durability of the devices. In this paper, we present a simple, yet robust, two-step surface modification method to significantly enhance the tribological performance of MEMS/NEMS materials. The two-step method involves oxygen plasma treatment of polymeric films and the application of a nanolubricant, namely perfluoropolyether. We apply the two-step method to the two most important MEMS/NEMS structural materials, namely silicon and SU8 polymer. On applying surface modification to these materials, their initial coefficient of friction reduces by ~4-7 times and the steady-state coefficient of friction reduces by ~2.5-3.5 times. Simultaneously, the wear durability of both the materials increases by >1000 times. The two-step method is time effective as each of the steps takes the time duration of approximately 1 min. It is also cost effective as the oxygen plasma treatment is a part of the MEMS/NEMS fabrication process. The two-step method can be readily and easily integrated into MEMS/NEMS fabrication processes. It is anticipated that this method will work for any kind of structural material from which MEMS/NEMS are or can be made.

  1. Fabrication of tunable diffraction grating by imprint lithography with photoresist mold

    Science.gov (United States)

    Yamada, Itsunari; Ikeda, Yusuke; Higuchi, Tetsuya

    2018-05-01

    We fabricated a deformable transmission silicone [poly(dimethylsiloxane)] grating using a two-beam interference method and imprint lithography and evaluated its optical characteristics during a compression process. The grating pattern with 0.43 μm depth and 1.0 μm pitch was created on a silicone surface by an imprinting process with a photoresist mold to realize a simple, low-cost fabrication process. The first-order diffraction transmittance of this grating reached 10.3% at 632.8 nm wavelength. We also measured the relationship between the grating period and compressive stress to the fabricated elements. The grating period changed from 1.0 μm to 0.84 μm by 16.6% compression of the fabricated element in one direction, perpendicular to the grooves, and the first-order diffraction transmittance was 8.6%.

  2. Degradation effects ad Si-depth profiling in photoresists using ion beam analysis

    International Nuclear Information System (INIS)

    Ijzendoorn, L.J. van; Schellekens, J.P.W.

    1989-01-01

    The reaction of silicon-containing vapour with a photoresist layer, as used in dry developable lithographic processes, was studied with Rutherford backscattering spectrometry (RBS). Degradation of the polymer layer was observed, but the total amount of incorporated Si was found to be constant during the measurement. Si-depth profiles were found to be independent of dose and in agreement with profiles obtained with secondary ion mass spectrometry (SIMS). The detection of hydrogen by elastic recoil detection (ERD) was used to study the degradation in detail. The decrease in hydrogen countrate from a layer of polystyrene on Si in combination with the shift of the Si-substrate edge in the corresponding RBS spectra was used for a model description. Only one degradation cross-section for hydrogen and one for carbon, both independent of beam current and dose, were required for a successful fit of the experimental data. (orig.)

  3. Oxide Nanoparticle EUV (ONE) Photoresists: Current Understanding of the Unusual Patterning Mechanism

    KAUST Repository

    Jiang, Jing; Zhang, Ben; Yu, Mufei; Li, Li; Neisser, Mark; Sung Chun, Jun; Giannelis, Emmanuel P.; Ober, Christopher K.

    2015-01-01

    © 2015 SPST. In the past few years, industry has made significant progress to deliver a stable high power EUV scanner and a 100 W light source is now being tested on the manufacuring scale. The success of a high power EUV source demands a fast and high resolution EUV resist. However, chemcially amplied resists encounter unprecedented challenges beyond the 22 nm node due to resolution, roughness and sensitivity tradeoffs. Unless novel solutions for EUV resists are proposed and further optimzed, breakthroughs can hardly be achieved. Oxide nanoparticle EUV (ONE) resists stablized by organic ligands were originally proposed by Ober et al. Recently this work attracts more and more attention due to its extraordinanry EUV sensitivity. This new class of photoresist utilizes ligand cleavage with a ligand exchange mechanism to switch its solubilty for dual-tone patterning. Therefore, ligand selection of the nanoparticles is extremely important to its EUV performance.

  4. Diffusion and solubility of Au implanted into the AZ1350 photoresist

    International Nuclear Information System (INIS)

    Soares, M.R.F.; Kaschny, J.R.A.; Santos, J.H.R. dos; Amaral, L.; Behar, M.; Fink, D.

    2000-01-01

    In the present paper we report diffusion and solubility results for Au into the photoresist AZ1350. Au was implanted into AZ1350 films at very low energy (E=20 keV) and fluences (PHI=10 12 and 5x10 12 Au/cm 2 ). In this way the radiation damage introduced by the implantation process was minimized and cluster formation was avoided. Annealing was performed in the 150-300 deg. C temperature range and the as implanted and thermal treated samples were analyzed using the Rutherford backscattering (RBS) technique. For the lowest implantation fluence the results have shown a regular atomic diffusion process characterized by an activation energy of E a =640 meV. Instead, for PHI=5x10 12 Au/cm 2 the diffusional mechanism has revealed the effects of the radiation damage. In addition solubility measurements indicate that the solubility limit at 250 deg. C is of the order 0.3 at.%

  5. Microwave-Assisted Syntheses in Recyclable Ionic Liquids: Photoresists Based on Renewable Resources.

    Science.gov (United States)

    Petit, Charlotte; Luef, Klaus P; Edler, Matthias; Griesser, Thomas; Kremsner, Jennifer M; Stadler, Alexander; Grassl, Bruno; Reynaud, Stéphanie; Wiesbrock, Frank

    2015-10-26

    The copoly(2-oxazoline) pNonOx80 -stat-pDc(=) Ox20 can be synthesized from the cationic ring-opening copolymerization of 2-nonyl-2-oxazoline NonOx and 2-dec-9'-enyl-2-oxazoline Dc(=) Ox in the ionic liquid n-hexyl methylimidazolium tetrafluoroborate under microwave irradiation in 250 g/batch quantities. The polymer precipitates upon cooling, enabling easy recovery of the polymer and the ionic liquid. Both monomers can be obtained from fatty acids from renewable resources. pNonOx80 -stat-pDc(=) Ox20 can be used as polymer in a photoresist (resolution of 1 μm) based on UV-induced thiol-ene reactions. © 2015 The Authors. Published by Wiley-VCH Verlag GmbH & Co. KGaA.

  6. Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning

    KAUST Repository

    Li, Li

    2015-07-28

    © 2015 American Chemical Society. Hf-based hybrid photoresist materials with three different organic ligands were prepared by a sol-gel-based method, and their patterning mechanism was investigated in detail. All hybrid nanoparticle resists are patternable using UV exposure. Their particle sizes show a dramatic increase from the initial 3-4 nm to submicron size after exposure, with no apparent inorganic content or thermal property change detected. XPS results showed that the mass percentage of the carboxylic group in the structure of nanoparticles decreased with increasing exposure duration. The particle coarsening sensitivities of those hybrid nanoparticles are consistent with their EUV performance. The current work provides an understanding for the development mechanism and future guidance for the design and processing of high performance resist materials for large-scale microelectronics device fabrication.

  7. Depth profile analysis of polymerized fluorine compound on photo-resist film with angle-resolved XPS

    International Nuclear Information System (INIS)

    Iijima, Yoshitoki; Kubota, Toshio; Oinaka, Syuhei

    2013-01-01

    Angle-resolved XPS (ARXPS) is an observation technique which is very effective in chemical depth analysis method less than photoelectron detected depth. For the analysis of depth profile, several analysis methods have been proposed to calculate the depth profile using the ARXPS method. The present report is the measurements of depth profile of the fluorine in a fluorine-containing photo-resist film using the ARXPS method and the depth profile of concentration have been successfully determined using the ARCtick 1.0 software. It has been observed that thickness of the fluorocarbon enriched surface layer of the photo-resist was 2.7 nm, and so that the convert of the ARXPS data from the angle profile to the depth profile was proved to be useful analysis method for the ultrathin layer depth. (author)

  8. Improving wettability of photo-resistive film surface with plasma surface modification for coplanar copper pillar plating of IC substrates

    International Nuclear Information System (INIS)

    Xiang, Jing; Wang, Chong; Chen, Yuanming; Wang, Shouxu; Hong, Yan; Zhang, Huaiwu; Gong, Lijun; He, Wei

    2017-01-01

    Highlights: • Air atmosphere plasmacould generatehydrophilic groups of photo-resistive film. • Better wettability of photo-resistive filmled tohigher plating uniformity of copper pillars. • New flow isreduced cost, simplified process and elevated productivity. - Abstract: The wettability of the photo-resistive film (PF) surfaces undergoing different pretreatments including the O_2−CF_4 low-pressure plasma (OCLP) and air plasma (AP), is investigated by water contact angle measurement instrument (WCAMI) before the bottom-up copper pillar plating. Chemical groups analysis performed by attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR) and X-ray photoelectron spectra (XPS) shows that after the OCLP and wash treatment, the wettability of PF surface is attenuated, because embedded fluorine and decreased oxygen content both enhance hydrophobicity. Compared with OCLP treatment, the PF surface treatment by non-toxic air plasma displays features of C−O, O−C=O, C=O and −NO_2 by AIR-FTIR and XPS, and a promoted wettability by WCAM. Under the identical electroplating condition, the surface with a better wettability allows electrolyte to spontaneously soak all the places of vias, resulting in improved copper pillar uniformity. Statistical analysis of metallographic data shows that more coplanar and flat copper pillars are achieved with the PF treatment of air plasma. Such modified copper-pillar-plating technology meets the requirement of accurate impedance, the high density interconnection for IC substrates.

  9. Improving wettability of photo-resistive film surface with plasma surface modification for coplanar copper pillar plating of IC substrates

    Energy Technology Data Exchange (ETDEWEB)

    Xiang, Jing; Wang, Chong; Chen, Yuanming; Wang, Shouxu; Hong, Yan; Zhang, Huaiwu [State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054 (China); Gong, Lijun [Research and Development Department, Guangzhou Fastprint Circuit Tech Co., Ltd., Guangzhou 510663 (China); He, Wei, E-mail: heweiz@uestc.edu.cn [State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054 (China); Research and Development Department, Guangdong Guanghua Sci-Tech Co., Ltd., Shantou 515000 (China)

    2017-07-31

    Highlights: • Air atmosphere plasmacould generatehydrophilic groups of photo-resistive film. • Better wettability of photo-resistive filmled tohigher plating uniformity of copper pillars. • New flow isreduced cost, simplified process and elevated productivity. - Abstract: The wettability of the photo-resistive film (PF) surfaces undergoing different pretreatments including the O{sub 2}−CF{sub 4} low-pressure plasma (OCLP) and air plasma (AP), is investigated by water contact angle measurement instrument (WCAMI) before the bottom-up copper pillar plating. Chemical groups analysis performed by attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR) and X-ray photoelectron spectra (XPS) shows that after the OCLP and wash treatment, the wettability of PF surface is attenuated, because embedded fluorine and decreased oxygen content both enhance hydrophobicity. Compared with OCLP treatment, the PF surface treatment by non-toxic air plasma displays features of C−O, O−C=O, C=O and −NO{sub 2} by AIR-FTIR and XPS, and a promoted wettability by WCAM. Under the identical electroplating condition, the surface with a better wettability allows electrolyte to spontaneously soak all the places of vias, resulting in improved copper pillar uniformity. Statistical analysis of metallographic data shows that more coplanar and flat copper pillars are achieved with the PF treatment of air plasma. Such modified copper-pillar-plating technology meets the requirement of accurate impedance, the high density interconnection for IC substrates.

  10. Co-fabrication of chitosan and epoxy photoresist to form microwell arrays with permeable hydrogel bottoms

    Science.gov (United States)

    Ornoff, Douglas M.; Wang, Yuli; Proctor, Angela; Shah, Akash S.; Allbritton, Nancy L.

    2015-01-01

    Microfabrication technology offers the potential to create biological platforms with customizable patterns and surface chemistries, allowing precise control over the biochemical microenvironment to which a cell or group of cells is exposed. However, most microfabricated platforms grow cells on impermeable surfaces. This report describes the co-fabrication of a micropatterned epoxy photoresist film with a chitosan film to create a freestanding array of permeable, hydrogel-bottomed microwells. These films possess optical properties ideal for microscopy applications, and the chitosan layers are semi-permeable with a molecular exclusion of 9.9 ± 2.1 kDa. By seeding cells into the microwells, overlaying inert mineral oil, and supplying media via the bottom surface, this hybrid film permits cells to be physically isolated from one another but maintained in culture for at least 4 days. Arrays co-fabricated using these materials reduce both large-molecular-weight biochemical crosstalk between cells and mixing of different clonal populations, and will enable high-throughput studies of cellular heterogeneity with increased ability to customize dynamic interrogations compared to materials in currently available technologies. PMID:26447557

  11. Highly efficient silver patterning without photo-resist using simple silver precursors

    International Nuclear Information System (INIS)

    Byun, Younghun; Hwang, Eoc-Chae; Lee, Sang-Yun; Lyu, Yi-Yeol; Yim, Jin-Heong; Kim, Jin-Young; Chang, Seok; Pu, Lyong Sun; Kim, Ji Man

    2005-01-01

    Highly efficient method for silver patterning without photo-resist was developed by using high photosensitive organo-silver precursors, which were prepared by a simple reaction of silver salts and excess of amines. The FT-IR and GC-MS spectra were recorded depending on UV exposure time, for (n-PrNH 2 )Ag(NO 3 ).0.5MeCN and (n-PrNH 2 )Ag(NO 2 ).0.5MeCN, to understand the photolysis mechanism. The results indicate not only dissociation of coordinated amine and acetonitrile, but also decomposition of corresponding anion upon UV irradiation. When a precursor thin film was exposed to broadband UV irradiation, a partially reduced and insoluble silver species were formed within several minutes. After development, the irradiated areas were treated with a reducing agent to obtain pure metallic patterns. Subsequently, annealing step was followed at 100-350 deg. C to increase the adhesion of interface and cohesion of silver particles. The line resolution of 5 μm was obtained by the present silver precursors. Film thickness was also controllable from 50 to 250 nm by repetition of the above procedure. The average electrical conductivity was in the range of 3-43 Ω cm, measured by four-point probe technique. AES depth profile of the silver pattern thus obtained showed carbon and oxygen contents are less than 1% through the whole range. Even though sulfur contaminant exists on the surface, it was believed that nearly pure silver pattern was generated

  12. Free-floating magnetic microstructures by mask photolithography

    Science.gov (United States)

    Huong Au, Thi; Thien Trinh, Duc; Bich Do, Danh; Phu Nguyen, Dang; Cong Tong, Quang; Diep Lai, Ngoc

    2018-03-01

    This work explores the fabrication of free-floating magnetic structures on a photocurable nanocomposite consisting of superparamagnetic magnetite nanoparticles (Fe3O4) and a commercial SU-8 negative tone photoresist. The nanocomposite was synthesized by mixing magnetic nanoparticles with different kinds of SU-8 resin. We demonstrated that the dispersion of Fe3O4 nanoparticles in nanocomposite solution strongly depended on the particles concentration, the viscosity of SU-8 polymer, and the mixing time. The influence of these factors was demonstrated by examining the structures fabricated by mask photolithography technique. We obtained the best quality of structures at a low concentration, below 5 wt%, of Fe3O4 nanoparticles in SU-8 2005 photoresist for a mixing time of about 20 days. The manipulation of free-floating magnetic microstructures by an external magnetic field was also demonstrated showing promising applications of this magnetic nanocomposite.

  13. Low leaching and low LWR photoresist development for 193 nm immersion lithography

    Science.gov (United States)

    Ando, Nobuo; Lee, Youngjoon; Miyagawa, Takayuki; Edamatsu, Kunishige; Takemoto, Ichiki; Yamamoto, Satoshi; Tsuchida, Yoshinobu; Yamamoto, Keiko; Konishi, Shinji; Nakano, Katsushi; Tomoharu, Fujiwara

    2006-03-01

    With no apparent showstopper in sight, the adoption of ArF immersion technology into device mass production is not a matter of 'if' but a matter of 'when'. As the technology matures at an unprecedented speed, many of initial technical difficulties have been cleared away and the use of a protective layer known as top coat, initially regarded as a must, now becomes optional, for example. Our focus of interest has also sifted to more practical and production related issues such as defect reducing and performance enhancement. Two major types of immersion specific defects, bubbles and a large number of microbridges, were observed and reported elsewhere. The bubble defects seem to decrease by improvement of exposure tool. But the other type defect - probably from residual water spots - is still a problem. We suspect that the acid leaching from resist film causes microbridges. When small water spots were remained on resist surface after exposure, acid catalyst in resist film is leaching into the water spots even though at room temperature. After water from the spot is dried up, acid molecules are condensed at resist film surface. As a result, in the bulk of resist film, acid depletion region is generated underneath the water spot. Acid catalyzed deprotection reaction is not completed at this acid shortage region later in the PEB process resulting in microbridge type defect formation. Similar mechanism was suggested by Kanna et al, they suggested the water evaporation on PEB plate. This hypothesis led us to focus on reducing acid leaching to decrease residual water spot-related defect. This paper reports our leaching measurement results and low leaching photoresist materials satisfying the current leaching requirements outlined by tool makers without topcoat layer. On the other hand, Nakano et al reported that the higher receding contact angle reduced defectivity. The higher receding contact angle is also a key item to increase scan speed. The effort to increase the

  14. Hierarchical Micro/Nano Structures by Combined Self-Organized Dewetting and Photopatterning of Photoresist Thin Films.

    Science.gov (United States)

    Sachan, Priyanka; Kulkarni, Manish; Sharma, Ashutosh

    2015-11-17

    Photoresists are the materials of choice for micro/nanopatterning and device fabrication but are rarely used as a self-assembly material. We report for the first time a novel interplay of self-assembly and photolithography for fabrication of hierarchical and ordered micro/nano structures. We create self-organized structures by the intensified dewetting of unstable thin (∼10 nm to 1 μm) photoresist films by annealing them in an optimal solvent and nonsolvent liquid mixture that allows spontaneous dewetting to form micro/nano smooth dome-like structures. The density, size (∼100 nm to millimeters), and curvature/contact angle of the dome/droplet structures are controlled by the film thickness, composition of the dewetting liquid, and time of annealing. Ordered dewetted structures are obtained simply by creating spatial variation of viscosity by ultraviolet exposure or by photopatterning before dewetting. Further, the structures thus fabricated are readily photopatterned again on the finer length scales after dewetting. We illustrate the approach by fabricating several three-dimensional structures of varying complexity with secondary and tertiary features.

  15. Integrated Real-Time Control and Imaging System for Microbiorobotics and Nanobiostructures

    Science.gov (United States)

    2016-01-11

    coordination of bacteria. A. Control of Bacteria-Powered Microrobots Using Static Obstacle Avoidance Algorithm A bacteria-powered microrobot ( BPM ) is...autonomous navigation algorithm for BPM obstacle avoidance. Moreover, we have demonstrated obstacle avoidance in cluttered environments modifying...different parameters in our algorithm [1]. Briefly, BPMs were fabricated by first using conventional photolithography with SU-8 negative photoresist to

  16. The fabrication of diversiform nanostructure forests based on residue nanomasks synthesized by oxygen plasma removal of photoresist

    Energy Technology Data Exchange (ETDEWEB)

    Mao Haiyang; Wu Di; Wu Wengang; Hao Yilong [National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing 100871 (China); Xu Jun, E-mail: wuwg@ime.pku.edu.c [Electron Microscopy Laboratory, Peking University, Beijing 100871 (China)

    2009-11-04

    A simple lithography-free approach for fabricating diversiform nanostructure forests is presented. The key technique of the approach is that randomly distributed nanoscale residues can be synthesized on substrates simply by removing photoresist with oxygen plasma bombardment. These nanoresidues can function as masks in the subsequent etching process for nanopillars. By further spacer and then deep etching processes, a variety of forests composed of regular, tulip-like or hollow-head nanopillars as well as nanoneedles are successfully achieved in different etching conditions. The pillars have diameters of 30-200 nm and heights of 400 nm-3 {mu}m. The needles reach several microns in height, with their tips less than 10 nm in diameter. Moreover, microstructures containing these nanostructure forests, such as surface microchannels, have also been fabricated. This approach is compatible with conventional micro/nano-electromechanical system (MEMS/NEMS) fabrication.

  17. The fabrication of diversiform nanostructure forests based on residue nanomasks synthesized by oxygen plasma removal of photoresist

    International Nuclear Information System (INIS)

    Mao Haiyang; Wu Di; Wu Wengang; Hao Yilong; Xu Jun

    2009-01-01

    A simple lithography-free approach for fabricating diversiform nanostructure forests is presented. The key technique of the approach is that randomly distributed nanoscale residues can be synthesized on substrates simply by removing photoresist with oxygen plasma bombardment. These nanoresidues can function as masks in the subsequent etching process for nanopillars. By further spacer and then deep etching processes, a variety of forests composed of regular, tulip-like or hollow-head nanopillars as well as nanoneedles are successfully achieved in different etching conditions. The pillars have diameters of 30-200 nm and heights of 400 nm-3 μm. The needles reach several microns in height, with their tips less than 10 nm in diameter. Moreover, microstructures containing these nanostructure forests, such as surface microchannels, have also been fabricated. This approach is compatible with conventional micro/nano-electromechanical system (MEMS/NEMS) fabrication.

  18. Synthesis and field emission properties of carbon nanotubes grown in ethanol flame based on a photoresist-assisted catalyst annealing process

    International Nuclear Information System (INIS)

    Yang Xiaoxia; Fang Guojia; Liu Nishuang; Wang Chong; Zheng Qiao; Zhou Hai; Zhao Dongshan; Long Hao; Liu Yuping; Zhao Xingzhong

    2009-01-01

    Carbon nanotubes (CNTs) have been grown directly on a Si substrate without a diffusion barrier in ethanol diffusion flame using Ni as the catalyst after a photoresist-assisted catalyst annealing process. The growth mechanism of as-synthesized CNTs is confirmed by scanning electron microscopy, high resolution transmission-electron microscopy and energy-dispersive spectroscopy. The photoresist is the key for the formation of active catalyst particles during annealing process, which then result in the growth of CNTs. The catalyst annealing temperature has been found to affect the morphologies and field electron emission properties of CNTs significantly. The field emission properties of as-grown CNTs are investigated with a diode structure and the obtained CNTs exhibit enhanced characteristics. This technique will be applicable to a low-cost fabrication process of electron-emitter arrays.

  19. When negation is not negation

    OpenAIRE

    Milicevic, Nataša

    2008-01-01

    In this paper I will discuss the formation of different types of yes/no questions in Serbian (examples in (1)), focusing on the syntactically and semantically puzzling example (1d), which involves the negative auxiliary inversion. Although there is a negative marker on the fronted auxiliary, the construction does not involve sentential negation. This coincides with the fact that the negative quantifying NPIs cannot be licensed. The question formation and sentential negation have similar synta...

  20. Improving wettability of photo-resistive film surface with plasma surface modification for coplanar copper pillar plating of IC substrates

    Science.gov (United States)

    Xiang, Jing; Wang, Chong; Chen, Yuanming; Wang, Shouxu; Hong, Yan; Zhang, Huaiwu; Gong, Lijun; He, Wei

    2017-07-01

    The wettability of the photo-resistive film (PF) surfaces undergoing different pretreatments including the O2sbnd CF4 low-pressure plasma (OCLP) and air plasma (AP), is investigated by water contact angle measurement instrument (WCAMI) before the bottom-up copper pillar plating. Chemical groups analysis performed by attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR) and X-ray photoelectron spectra (XPS) shows that after the OCLP and wash treatment, the wettability of PF surface is attenuated, because embedded fluorine and decreased oxygen content both enhance hydrophobicity. Compared with OCLP treatment, the PF surface treatment by non-toxic air plasma displays features of Csbnd O, Osbnd Cdbnd O, Cdbnd O and sbnd NO2 by AIR-FTIR and XPS, and a promoted wettability by WCAM. Under the identical electroplating condition, the surface with a better wettability allows electrolyte to spontaneously soak all the places of vias, resulting in improved copper pillar uniformity. Statistical analysis of metallographic data shows that more coplanar and flat copper pillars are achieved with the PF treatment of air plasma. Such modified copper-pillar-plating technology meets the requirement of accurate impedance, the high density interconnection for IC substrates.

  1. Directed Self-assembly of Block Copolymer with Sub-15 nm Domain Spacing Using Nanoimprinted Photoresist Templates

    Science.gov (United States)

    Sun, Zhiwei; Chen, Zhenbin; Zhang, Wenxu; Coughlin, E. Bryan; Xiao, Shuaigang; Russell, Thomas

    There has been increasing interest in preparing block copolymer thin films with ultra-small domain spacings for use as etching masks for ultra-high resolution nanolithography. One method to prepare block copolymer materials with small feature sizes is salt doping, increasing the Flory-Huggins interaction and allowing microphase separation to be maintained at lower molecular weights. Lamellae-forming P2VP- b-PS- b-P2VP block copolymer with various molecular weight was synthesized using RAFT polymerization with a dual functional chain transfer agent. Copper (II) Chloride or Gold (III) chloride was found to be selectively associated with P2VP block and increase the unfavorable interactions between PS and P2VP blocks, driving the disordered block copolymer into the ordered state. A 14 nm lamellar spacing of P2VP- b-PS- b-P2VP thin film was prepared using copper (II) Chloride doping after acetone vapor annealing on neutral brushes. Metallic nano-wire arrays were prepared after selective infiltration of platinum salt into the P2VP domain and oxygen plasma treatment. The directed self-assembly of salt doped P2VP- b-PS- b-P2VP triblock copolymer having long-rang lateral order on nanoimprinted photoresist templates with shallow trenches was also studied.

  2. Supercritical CO2 drying of poly(methyl methacrylate) photoresist for deep x-ray lithography: a brief note

    Science.gov (United States)

    Shukla, Rahul; Abhinandan, Lala; Sharma, Shivdutt

    2017-07-01

    Poly(methyl methacrylate) (PMMA) is an extensively used positive photoresist for deep x-ray lithography. The post-development release of the microstructures of PMMA becomes very critical for high aspect ratio fragile and freestanding microstructures. Release of high aspect ratio comb-drive microstructure of PMMA made by one-step x-ray lithography (OXL) is studied. The effect of low-surface tension Isopropyl alcohol (IPA) over water is investigated for release of the high aspect ratio microstructures using conventional and supercritical (SC) CO2 drying. The results of conventional drying are also compared for the samples released or dried in both in-house developed and commercial SC CO2 dryer. It is found that in all cases the microstructures of PMMA are permanently deformed and damaged while using SC CO2 for drying. For free-standing high aspect ratio microstructures of PMMA made by OXL, it is advised to use low-surface tension IPA over DI water. However, this brings a limitation on the design of the microstructure.

  3. Generation of laser-induced periodic surface structures in indium-tin-oxide thin films and two-photon lithography of ma-N photoresist by sub-15 femtosecond laser microscopy for liquid crystal cell application

    Science.gov (United States)

    Klötzer, Madlen; Afshar, Maziar; Feili, Dara; Seidel, Helmut; König, Karsten; Straub, Martin

    2015-03-01

    Indium-tin-oxide (ITO) is a widely used electrode material for liquid crystal cell applications because of its transparency in the visible spectral range and its high electrical conductivity. Important examples of applications are displays and optical phase modulators. We report on subwavelength periodic structuring and precise laser cutting of 150 nm thick indium-tin-oxide films on glass substrates, which were deposited by magnetron reactive DC-sputtering from an indiumtin target in a low-pressure oxygen atmosphere. In order to obtain nanostructured electrodes laser-induced periodic surface structures with a period of approximately 100 nm were generated using tightly focused high-repetition rate sub-15 femtosecond pulsed Ti:sapphire laser light, which was scanned across the sample by galvanometric mirrors. Three-dimensional spacers were produced by multiphoton photopolymerization in ma-N 2410 negative-tone photoresist spin-coated on top of the ITO layers. The nanostructured electrodes were aligned in parallel to set up an electrically switchable nematic liquid crystal cell.

  4. Negative mass

    International Nuclear Information System (INIS)

    Hammond, Richard T

    2015-01-01

    Some physical aspects of negative mass are examined. Several unusual properties, such as the ability of negative mass to penetrate any armor, are analysed. Other surprising effects include the bizarre system of negative mass chasing positive mass, naked singularities and the violation of cosmic censorship, wormholes, and quantum mechanical results as well. In addition, a brief look into the implications for strings is given. (paper)

  5. Understanding dissolution behavior of 193nm photoresists in organic solvent developers

    Science.gov (United States)

    Lee, Seung-Hyun; Park, Jong Keun; Cardolaccia, Thomas; Sun, Jibin; Andes, Cecily; O'Connell, Kathleen; Barclay, George G.

    2012-03-01

    Herein, we investigate the dissolution behavior of 193-nm chemically amplified resist in different organic solvents at a mechanistic level. We previously reported the effect of solvent developers on the negative tone development (NTD) process in both dry and immersion lithography, and demonstrated various resist performance parameters such as photospeed, critical dimension uniformity, and dissolution rate contrast are strongly affected by chemical nature of the organic developer. We further pursued the investigation by examining the dependence of resist dissolution behavior on their solubility properties using Hansen Solubility Parameter (HSP). The effects of monomer structure, and resist composition, and the effects of different developer chemistry on dissolution behaviors were evaluated by using laser interferometry and quartz crystal microbalance. We have found that dissolution behaviors of methacrylate based resists are significantly different in different organic solvent developers such as OSDTM-1000 Developer* and n-butyl acetate (nBA), affecting their resist performance. This study reveals that understanding the resist dissolution behavior helps to design robust NTD materials for higher resolution imaging.

  6. Negative Leadership

    Science.gov (United States)

    2013-03-01

    Negative Leadership by Colonel David M. Oberlander United States Army United States Army War...SUBTITLE Negative Leadership 5a. CONTRACT NUMBER 5b. GRANT NUMBER 5c. PROGRAM ELEMENT NUMBER 6. AUTHOR(S) Colonel David M...Dr. Richard C. Bullis Department of Command Leadership , and Management 8. PERFORMING ORGANIZATION REPORT NUMBER 9. SPONSORING/MONITORING

  7. Negative liability

    NARCIS (Netherlands)

    Dari-Mattiacci, G.

    2009-01-01

    Negative and positive externalities pose symmetrical problems to social welfare. The law internalizes negative externalities by providing general tort liability rules. According to such rules, those who cause harm to others should pay compensation. In theory, in the presence of positive

  8. Negative ... concord?

    NARCIS (Netherlands)

    Giannakidou, A

    The main claim of this paper is that a general theory of negative concord (NC) should allow for the possibility of NC involving scoping of a universal quantifier above negation. I propose that Greek NC instantiates this option. Greek n-words will be analyzed as polarity sensitive universal

  9. Mechanisms for plasma etching of HfO{sub 2} gate stacks with Si selectivity and photoresist trimming

    Energy Technology Data Exchange (ETDEWEB)

    Shoeb, Juline; Kushner, Mark J. [Department of Electrical and Computer Engineering, Iowa State University, Ames, Iowa 50011 (United States); Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109-2122 (United States)

    2009-11-15

    To minimize leakage currents resulting from the thinning of the insulator in the gate stack of field effect transistors, high-dielectric constant (high-k) metal oxides, and HfO{sub 2} in particular, are being implemented as a replacement for SiO{sub 2}. To speed the rate of processing, it is desirable to etch the gate stack (e.g., metal gate, antireflection layers, and dielectric) in a single process while having selectivity to the underlying Si. Plasma etching using Ar/BCl{sub 3}/Cl{sub 2} mixtures effectively etches HfO{sub 2} while having good selectivity to Si. In this article, results from integrated reactor and feature scale modeling of gate-stack etching in Ar/BCl{sub 3}/Cl{sub 2} plasmas, preceded by photoresist trimming in Ar/O{sub 2} plasmas, are discussed. It was found that BCl{sub n} species react with HfO{sub 2}, which under ion impact, form volatile etch products such as B{sub m}OCl{sub n} and HfCl{sub n}. Selectivity to Si is achieved by creating Si-B bonding as a precursor to the deposition of a BCl{sub n} polymer which slows the etch rate relative to HfO{sub 2}. The low ion energies required to achieve this selectivity then challenge one to obtain highly anisotropic profiles in the metal gate portion of the stack. Validation was performed with data from literature. The effect of bias voltage and key reactant probabilities on etch rate, selectivity, and profile are discussed.

  10. On grand unified SU(8)sub(L)xSU(8)sub(R) model

    International Nuclear Information System (INIS)

    Pirogov, Yu.F.

    1980-01-01

    A set of general prjnciples justifying the choice of the group SU(N)sub(L)xSU(N)sub(R) with N=8 as the grand unified symmetry group is considered. Accordjng to these principles the group SU(N)sub(L)xSU(N)sub(R) is one of the most natural unified groups. Namely this group is maximum symmetry group of kinetic term of the Lagrangian of one family, which conserves fermion number. A new principle has been introduced according to which one of the manifestations of extended conformal invariance at small distances is mirror doubling of set of fermions, which is necessary on the other hand for renormalizability of the given unified model

  11. Proton beam micromachining on strippable aqueous base developable negative resist

    International Nuclear Information System (INIS)

    Rajta, I.; Uzonyi, I.; Baradacs, E.; Chatzichristidi, M.; Raptis, I.; Valamontes, E.S.

    2004-01-01

    Complete text of publication follows. Proton Beam Micromachining (PBM, also known as P-beam writing), a novel direct- write process for the production of 3D microstructures, can be used to make multilevel structures in a single layer of resist by varying the ion energy. The interaction between the bombarding ions and the target material is mainly ionization, and very few ions suffer high angle nuclear collisions, therefore structures made with PBM have smooth near vertical side walls. The most commony applied resists in PBM are the positive, conventional, polymethyl methacrylate (PMMA); and the negative, chemically amplified, SU-8 (Micro Chem Corp). SU-8 is an epoxy based resist suitable also for LIGA and UV-LIGA processes, it offers good sensitivity, good process latitude, very high aspect ratio and therefore it dominates in the high aspect ratio micromachining applications. SU-8 requires 30 nC/mm 2 fluence for PBM irradiations at 2 MeV protons. Its crosslinking chemistry is based on the eight epoxy rings in the polymer chain, which provide a very dense three dimensional network in the presence of suitably activated photo acid generators (PAGs) which is very difficult to be stripped away after development. Thus, stripping has to be assisted with plasma processes or with special liquid removers. Moreover, the SU-8 developer is organic, propylene glycol methyl ether acetate (PGMEA), and thus environmentally non-friendly. To overcome the SU-8 stripping limitations, design of a negative resist system where solubility change is not based solely on cross- linking but also on the differentiation of hydrophilicity between exposed and non-exposed areas is desirable. A new resist formulation, fulfilling the above specifications has been developed recently [1]. This formulation is based on a specific grade epoxy novolac (EP) polymer, a partially hydrogenated poly-4-hydroxy styrene (PHS) polymer, and an onium salt as photoacid generator (PAG), and has been successfully

  12. Strain-Mediated Inverse Photoresistivity in SrRuO3/La0.7Sr0.3MnO3Superlattices

    KAUST Repository

    Liu, Heng-Jui

    2015-12-09

    © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. In the pursuit of novel functionalities by utilizing the lattice degree of freedom in complex oxide heterostructure, the control mechanism through direct strain manipulation across the interfaces is still under development, especially with various stimuli, such as electric field, magnetic field, light, etc. In this study, the superlattices consisting of colossal-magnetoresistive manganites La0.7Sr0.3MnO3 (LSMO) and photostrictive SrRuO3 (SRO) have been designed to investigate the light-dependent controllability of lattice order in the corresponding functionalities and rich interface physics. Two substrates, SrTiO3 (STO) and LaAlO3 (LAO), have been employed to provide the different strain environments to the superlattice system, in which the LSMO sublayers exhibit different orbital occupations. Subsequently, by introducing light, we can modulate the strain state and orbital preference of LSMO sublayers through light-induced expansion of SRO sublayers, leading to surprisingly opposite changes in photoresistivity. The observed photoresistivity decreases in the superlattice grown on STO substrate while increases in the superlattice grown on LAO substrate under light illumination. This work has presented a model system that demonstrates the manipulation of orbital-lattice coupling and the resultant functionalities in artificial oxide superlattices via light stimulus. A fascinating model system of optic-driven functionalities has been achieved by artificial superlattices consisting of manganite La0.7Sr0.3MnO3 (LSMO) and photostrictive SrRuO3 (SRO). With design of different initial strain and orbital states in superlattices, we can even control the photoresistivity of the superlattices in an opposite trend that cannot be achieved in pure single film.

  13. Negative CO

    NARCIS (Netherlands)

    Meysman, F.J.R.; Montserrat, F.

    2017-01-01

    Negative emission technologies (NETs) target the removal of carbon dioxide (CO2) from the atmosphere, and are being actively investigated as a strategy to limit global warming to within the 1.5–2°C targets of the 2015 UN climate agreement. Enhanced silicate weathering (ESW) proposes to

  14. Negative Certainty

    Science.gov (United States)

    Ariso, José María

    2017-01-01

    The definitions of "negative knowledge" and the studies in this regard published to date have not considered the categorial distinction Wittgenstein established between knowledge and certainty. Hence, the important role that certainty, despite its omission, should have in these definitions and studies has not yet been shown. In this…

  15. Fabrication of nanostructured transmissive optical devices on ITO-glass with UV1116 photoresist using high-energy electron beam lithography

    Science.gov (United States)

    Williams, Calum; Bartholomew, Richard; Rughoobur, Girish; Gordon, George S. D.; Flewitt, Andrew J.; Wilkinson, Timothy D.

    2016-12-01

    High-energy electron beam lithography for patterning nanostructures on insulating substrates can be challenging. For high resolution, conventional resists require large exposure doses and for reasonable throughput, using typical beam currents leads to charge dissipation problems. Here, we use UV1116 photoresist (Dow Chemical Company), designed for photolithographic technologies, with a relatively low area dose at a standard operating current (80 kV, 40-50 μC cm-2, 1 nAs-1) to pattern over large areas on commercially coated ITO-glass cover slips. The minimum linewidth fabricated was ˜33 nm with 80 nm spacing; for isolated structures, ˜45 nm structural width with 50 nm separation. Due to the low beam dose, and nA current, throughput is high. This work highlights the use of UV1116 photoresist as an alternative to conventional e-beam resists on insulating substrates. To evaluate suitability, we fabricate a range of transmissive optical devices, that could find application for customized wire-grid polarisers and spectral filters for imaging, which operate based on the excitation of surface plasmon polaritons in nanosized geometries, with arrays encompassing areas ˜0.25 cm2.

  16. Photoresists for Microlithography

    Indian Academy of Sciences (India)

    otherwise and listening to music both Indian and western: classical and modem. S V Eswaran has worked on lac resin, heterocycles and ... These free positions can undergo azo coupling reac- tion in the unexposed part with the photo active component, viz. the diazo compound. The consequent increase in IIl:olecular.

  17. Microfluidic sensors based on perforated cantilevers

    DEFF Research Database (Denmark)

    Noeth, Nadine-Nicole

    Arbejdet presenteret i denne PhD afhandling omhandler udviklingen af en mikrofluide sensor basered på bjælke teknologi. Bjælkerne er fremstillet i den negative photo-resist SU-8 og i SiN. I bjælkerne er der inkorporeret et array af huller. To nye sensorer er udviklet på baggrund af de perforerede...

  18. Polymer Compund Refractive Lenses for Hard X-ray Nanofocusing

    OpenAIRE

    Krywka, Christina; Last, Arndt; Marschall, Felix; Markus, Otto; Georgi, Sebastian; Mueller, Martin; Mohr, Jürgen

    2016-01-01

    Compound refractive lenses fabricated out of SU-8 negative photoresist have been used to generate a nanofocused, i.e. sub-μm sized X-ray focal spot at an X-ray nanodiffraction setup. X-ray microscopy and X-ray diffraction techniques have conceptually different demands on nanofocusing optical elements and so with the application of X-ray nanodiffraction in mind, this paper presents the results of an initial characterization of polymer lenses used as primary focusin...

  19. Infinitely high etch selectivity during CH4/H2/Ar inductively coupled plasma (ICP) etching of indium tin oxide (ITO) with photoresist mask

    International Nuclear Information System (INIS)

    Kim, D.Y.; Ko, J.H.; Park, M.S.; Lee, N.-E.

    2008-01-01

    Under certain conditions during ITO etching using CH 4 /H 2 /Ar inductively coupled plasmas, the etch rate selectivity of ITO to photoresist (PR) was infinitely high because the ITO films continued to be etched, but a net deposition of the α-C:H layer occurred on the top of the PR. Analyses of plasmas and etched ITO surfaces suggested that the continued consumption of the carbon and hydrogen in the deposited α-C:H layer by their chemical reaction with In and Sn atoms in the ITO resulting in the generation of volatile metal-organic etch products and by the ion-enhanced removal of the α-C:H layer presumably play important roles in determining the ITO etch rate and selectivity

  20. Proton beam micromachined buried microchannels in negative tone resist materials

    International Nuclear Information System (INIS)

    Rajta, I.; Chatzichristidi, M.; Baradacs, E.; Cserhati, C.; Raptis, I.; Manoli, K.; Valamontes, E.S.

    2007-01-01

    In the present work the Atomki, Debrecen microprobe facility has been used to write long tilted structures by 2 MeV protons. For the formation of the structures, two exposures have been carried out at +20 o and -20 o using a goniometer stage sample holder. The tilted structures were resolved in the negative tone resist materials SU-8 and ADEPR (an aqueous base developable chemically amplified resist). The length of the microchannels was varied between 100 μm and 1000 μm, the wall thickness was less than 10 μm. By applying the developed methodology it was possible to resolve the desired layout through the whole length of the channel

  1. Electromagnetic properties of photodefinable barium ferrite polymer composites

    Science.gov (United States)

    Sholiyi, Olusegun; Lee, Jaejin; Williams, John D.

    2014-07-01

    This article reports the magnetic and microwave properties of a Barium ferrite powder suspended in a polymer matrix. The sizes for Barium hexaferrite powder are 3-6 μm for coarse and 0.8-1.0 μm for the fine powder. Ratios 1:1 and 3:1 (by mass) of ferrite to SU8 samples were characterized and analyzed for predicting the necessary combinations of these powders with SU8 2000 Negative photoresist. The magnetization properties of these materials were equally determined and were analyzed using Vibrating Sample Magnetometer (VSM). The Thru, Reflect, Line (TRL) calibration technique was employed in determining complex relative permittivity and permeability of the powders and composites with SU8 between 26.5 and 40 GHz.

  2. Electromagnetic properties of photodefinable barium ferrite polymer composites

    Directory of Open Access Journals (Sweden)

    Olusegun Sholiyi

    2014-07-01

    Full Text Available This article reports the magnetic and microwave properties of a Barium ferrite powder suspended in a polymer matrix. The sizes for Barium hexaferrite powder are 3–6 μm for coarse and 0.8–1.0 μm for the fine powder. Ratios 1:1 and 3:1 (by mass of ferrite to SU8 samples were characterized and analyzed for predicting the necessary combinations of these powders with SU8 2000 Negative photoresist. The magnetization properties of these materials were equally determined and were analyzed using Vibrating Sample Magnetometer (VSM. The Thru, Reflect, Line (TRL calibration technique was employed in determining complex relative permittivity and permeability of the powders and composites with SU8 between 26.5 and 40 GHz.

  3. Flip-chip integration of Si bare dies on polymeric substrates at low temperature using ICA vias made in dry film photoresist

    Science.gov (United States)

    Vásquez Quintero, Andrés; Briand, Danick; de Rooij, Nico F.

    2015-04-01

    In this paper, a low temperature flip-chip integration technique for Si bare dies is demonstrated on flexible PET substrates with screen-printed circuits. The proposed technique is based on patterned blind vias in dry film photoresist (DP) filled with isotropic conductive adhesive (ICA). The DP material serves to define the vias, to confine the ICA paste (80 µm-wide and potentially 25 µm-wide vias), as an adhesion layer to improve the mechanical robustness of the assembly, and to protect additional circuitry on the substrate. The technique is demonstrated using gold-bumped daisy chain chips (DCCs), with electrical vias resistances in the order to hundreds of milliohms, and peel/shear adhesion strengths of 0.7 N mm-1 and 3.2 MPa, respectively, (i.e. at 1.2 MPa of bonding pressure). Finally, the mechanical robustness to bending forces was optimized through flexural mechanics models by placing the neutral plane at the DCC/DP adhesive interface. The optimization was performed by reducing the Si thickness from 400 to 37 µm, and resulted in highly robust integrated assemblies withstanding 10 000 cycles of dynamic bending at 40 mm of radius, with relative changes in vias resistance lower than 20%. In addition, the electrical vias resistance and adhesion strengths were compared to samples integrated with anisotropic conductive adhesives (ACAs). Besides the low temperature and high integration resolution, the proposed method is compatible with large area fabrication and multilayer architectures on foil.

  4. Effects of vacuum ultraviolet photons, ion energy and substrate temperature on line width roughness and RMS surface roughness of patterned 193 nm photoresist

    International Nuclear Information System (INIS)

    Titus, M J; Graves, D B; Yamaguchi, Y; Hudson, E A

    2011-01-01

    We present a comparison of patterned 193 nm photoresist (PR) line width roughness (LWR) of samples processed in a well characterized argon (Ar) inductively coupled plasma (ICP) system to RMS surface roughness and bulk chemical modification of blanket 193 nm PR samples used as control samples. In the ICP system, patterned and blanket PR samples are irradiated with Ar vacuum ultraviolet photons (VUV) and Ar ions while sample temperature, photon flux, ion flux and ion energy are controlled and measured. The resulting chemical modifications to bulk 193 nm PR (blanket) and surface roughness are analysed with Fourier transform infrared spectroscopy and atomic force microscopy (AFM). LWR of patterned samples are measured with scanning electron microscopy and blanket portions of the patterned PRs are measured with AFM. We demonstrate that with no RF-bias applied to the substrate the LWR of 193 nm PR tends to smooth and correlates with the smoothing of the RMS surface roughness. However, both LWR and RMS surface roughness increases with simultaneous high-energy (≥70 eV) ion bombardment and VUV-irradiation and is a function of exposure time. Both high- and low-frequency LWR correlate well with the RMS surface roughness of the patterned and blanket 193 nm PR samples. LWR, however, does not increase with temperatures ranging from 20 to 80 deg. C, in contrast to the RMS surface roughness which increases monotonically with temperature. It is unclear why LWR remains independent of temperature over this range. However, the fact that blanket roughness and LWR on patterned samples, both scale similarly with VUV fluence and ion energy suggests a similar mechanism is responsible for both types of surface morphology modifications.

  5. Effects of vacuum ultraviolet photons, ion energy and substrate temperature on line width roughness and RMS surface roughness of patterned 193 nm photoresist

    Energy Technology Data Exchange (ETDEWEB)

    Titus, M J; Graves, D B [Department of Chemical Engineering, University of California, Berkeley, CA 94720 (United States); Yamaguchi, Y; Hudson, E A, E-mail: graves@berkeley.edu [Lam Research Corporation, 4400 Cushing Parkway, Freemont, CA 94538 (United States)

    2011-03-02

    We present a comparison of patterned 193 nm photoresist (PR) line width roughness (LWR) of samples processed in a well characterized argon (Ar) inductively coupled plasma (ICP) system to RMS surface roughness and bulk chemical modification of blanket 193 nm PR samples used as control samples. In the ICP system, patterned and blanket PR samples are irradiated with Ar vacuum ultraviolet photons (VUV) and Ar ions while sample temperature, photon flux, ion flux and ion energy are controlled and measured. The resulting chemical modifications to bulk 193 nm PR (blanket) and surface roughness are analysed with Fourier transform infrared spectroscopy and atomic force microscopy (AFM). LWR of patterned samples are measured with scanning electron microscopy and blanket portions of the patterned PRs are measured with AFM. We demonstrate that with no RF-bias applied to the substrate the LWR of 193 nm PR tends to smooth and correlates with the smoothing of the RMS surface roughness. However, both LWR and RMS surface roughness increases with simultaneous high-energy ({>=}70 eV) ion bombardment and VUV-irradiation and is a function of exposure time. Both high- and low-frequency LWR correlate well with the RMS surface roughness of the patterned and blanket 193 nm PR samples. LWR, however, does not increase with temperatures ranging from 20 to 80 deg. C, in contrast to the RMS surface roughness which increases monotonically with temperature. It is unclear why LWR remains independent of temperature over this range. However, the fact that blanket roughness and LWR on patterned samples, both scale similarly with VUV fluence and ion energy suggests a similar mechanism is responsible for both types of surface morphology modifications.

  6. Simulation of SU-8 frequency-driven scratch drive actuators

    KAUST Repository

    Conchouso Gonzalez, David

    2013-04-01

    This paper presents the simulation of Scratch Drive Actuators (SDAs) for micro-robotic applications. SDAs use electrostatic forces to generate motion on top of an interdigitated electrode array. The purpose of this investigation is to evaluate several design geometries and micro-actuator configurations using ConventorWare®\\'s finite element analysis module. The study performed investigates the SDAs modal and electrostatic behavior and the effects of linking two or more SDAs together in a microrobot device. In addition, the interdigitated electrode array performance, used for power delivery, was studied by changing the thickness of its dielectric layer. We present our observations based on these studies, which will aid in the understanding and development of future SDA designs. © 2013 IEEE.

  7. Simulation of SU-8 frequency-driven scratch drive actuators

    KAUST Repository

    Conchouso Gonzalez, David; Carreno, Armando Arpys Arevalo; Castro, David; Al Rawashdeh, Ehab Jamal; Valencia Garcia, Manuel; Zaher, Amir Omar; Kosel, Jü rgen; Foulds, Ian G.

    2013-01-01

    This paper presents the simulation of Scratch Drive Actuators (SDAs) for micro-robotic applications. SDAs use electrostatic forces to generate motion on top of an interdigitated electrode array. The purpose of this investigation is to evaluate several design geometries and micro-actuator configurations using ConventorWare®'s finite element analysis module. The study performed investigates the SDAs modal and electrostatic behavior and the effects of linking two or more SDAs together in a microrobot device. In addition, the interdigitated electrode array performance, used for power delivery, was studied by changing the thickness of its dielectric layer. We present our observations based on these studies, which will aid in the understanding and development of future SDA designs. © 2013 IEEE.

  8. SU-8 Cantilever Sensor with Integrated Read-Out

    DEFF Research Database (Denmark)

    Johansson, Alicia Charlotte

    2007-01-01

    Cantilever baserede biosensorer kan bruges til så kaldet label-free detektion af små koncentrationer af molekyler i en opløsning. Når et specifikt molekyle binder til overfladen af en cantilever induceres et overfladestress som resulterer i en udbøjning af cantileveren. Cantileverens udbøjningen ...

  9. Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template.

    Science.gov (United States)

    Sun, Zhiwei; Chen, Zhenbin; Zhang, Wenxu; Choi, Jaewon; Huang, Caili; Jeong, Gajin; Coughlin, E Bryan; Hsu, Yautzong; Yang, XiaoMin; Lee, Kim Y; Kuo, David S; Xiao, Shuaigang; Russell, Thomas P

    2015-08-05

    Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  10. Engineering and Characterizing Light-Matter Interactions in Photonic Crystals

    Science.gov (United States)

    2010-01-01

    SU8 monomer has, on average, eight epoxy groups, that under go a ring-opening polymerization in the presence of an acid catalyst. SU8 falls into...copper oxide [49] into colloidal and SU8 polymer photonic crystal templates, respectively. 1.5.2 Gas-Phase Infilling Gas-phase deposition typically...resist using direct laser writing. 78 Figure 2. Scanning electron micrograph of an over- polymerized woodpile structure fabricated in SU8 photo-resist

  11. Negative-ion states

    International Nuclear Information System (INIS)

    Compton, R.N.

    1982-01-01

    In this brief review, we discuss some of the properties of atomic and molecular negative ions and their excited states. Experiments involving photon reactions with negative ions and polar dissociation are summarized. 116 references, 14 figures

  12. Negative ion detachment processes

    International Nuclear Information System (INIS)

    Champion, R.L.; Doverspike, L.D.

    1990-10-01

    This paper discusses the following topics: H - and D - collisions with atomic hydrogen; collisional decomposition of SF 6 - ; two-electron loss processes in negative ion collisions; associative electron detachment; and negative ion desorption from surfaces

  13. Sentential Negation in English

    Science.gov (United States)

    Mowarin, Macaulay

    2009-01-01

    This paper undertakes a detailed analysis of sentential negation in the English language with Chomsky's Government-Binding theory of Transformational Grammar as theoretical model. It distinguishes between constituent and sentential negation in English. The essay identifies the exact position of Negation phrase in an English clause structure. It…

  14. Negative ion sources

    International Nuclear Information System (INIS)

    Ishikawa, Junzo; Takagi, Toshinori

    1983-01-01

    Negative ion sources have been originally developed at the request of tandem electrostatic accelerators, and hundreds of nA to several μA negative ion current has been obtained so far for various elements. Recently, the development of large current hydrogen negative ion sources has been demanded from the standpoint of the heating by neutral particle beam injection in nuclear fusion reactors. On the other hand, the physical properties of negative ions are interesting in the thin film formation using ions. Anyway, it is the present status that the mechanism of negative ion action has not been so fully investigated as positive ions because the history of negative ion sources is short. In this report, the many mechanisms about the generation of negative ions proposed so far are described about negative ion generating mechanism, negative ion source plasma, and negative ion generation on metal surfaces. As a result, negative ion sources are roughly divided into two schemes, plasma extraction and secondary ion extraction, and the former is further classified into the PIG ion source and its variation and Duoplasmatron and its variation; while the latter into reflecting and sputtering types. In the second half of the report, the practical negative ion sources of each scheme are described. If the mechanism of negative ion generation will be investigated more in detail and the development will be continued under the unified know-how as negative ion sources in future, the development of negative ion sources with which large current can be obtained for any element is expected. (Wakatsuki, Y.)

  15. Polemic and Descriptive Negations

    DEFF Research Database (Denmark)

    Horslund, Camilla Søballe

    2011-01-01

    to semantics and pragmatics, negations can be used in three different ways, which gives rise to a typology of three different types of negations: 1) the descriptive negation, 2) the polemic negation, and 3) the meta-linguistic negation (Nølke 1999, 4). This typology illuminates the fact that the negation...... common in certain social context or genres, while polemic negations are more likely to come up in other genres and social settings. Previous studies have shown a relation between articulatory prominence and register, which may further inform the analysis. Hence, the paper investigates how articulatory...... prominence and register may either work in concert or oppose each other with respect to the cues they provide for the interpretation....

  16. Lithographic stress control for the self-assembly of polymer MEMS structures

    International Nuclear Information System (INIS)

    Lee, S-W; Sameoto, D; Parameswaran, M; Mahanfar, A

    2008-01-01

    We present a novel self-assembly mechanism to produce an assortment of predetermined three-dimensional micromechanical structures in polymer MEMS technology using lithographically defined areas of stress and mechanical reinforcement within a single structural material. This self-assembly technology is based on the tensile stress that arises during the cross-linking of the negative tone, epoxy-based photoresist SU-8. Two different thicknesses of SU-8 are used in a single compliant structure. The first SU-8 layer forms the main structural element and the second SU-8 layer determines the aspects of self-assembly. The second SU-8 layer thickness acts to both to create a stress differential within the structure as well as define the direction in which the induced stress will cause the structure to deform. In this manner, both the magnitude and direction of self-assembled structures can be controlled using a single lithographic step. Although this technique uses a single structural material, the basic concept may be adapted for other processes, with different material choices, for a wide variety of applications

  17. Negative Ion Density Fronts

    International Nuclear Information System (INIS)

    Igor Kaganovich

    2000-01-01

    Negative ions tend to stratify in electronegative plasmas with hot electrons (electron temperature Te much larger than ion temperature Ti, Te > Ti ). The boundary separating a plasma containing negative ions, and a plasma, without negative ions, is usually thin, so that the negative ion density falls rapidly to zero-forming a negative ion density front. We review theoretical, experimental and numerical results giving the spatio-temporal evolution of negative ion density fronts during plasma ignition, the steady state, and extinction (afterglow). During plasma ignition, negative ion fronts are the result of the break of smooth plasma density profiles during nonlinear convection. In a steady-state plasma, the fronts are boundary layers with steepening of ion density profiles due to nonlinear convection also. But during plasma extinction, the ion fronts are of a completely different nature. Negative ions diffuse freely in the plasma core (no convection), whereas the negative ion front propagates towards the chamber walls with a nearly constant velocity. The concept of fronts turns out to be very effective in analysis of plasma density profile evolution in strongly non-isothermal plasmas

  18. A Modality Called 'Negation'

    NARCIS (Netherlands)

    Berto, F.

    2015-01-01

    I propose a comprehensive account of negation as a modal operator, vindicating a moderate logical pluralism. Negation is taken as a quantifier on worlds, restricted by an accessibility relation encoding the basic concept of compatibility. This latter captures the core meaning of the operator. While

  19. Negative thermal expansion materials

    International Nuclear Information System (INIS)

    Evans, J.S.O.

    1997-01-01

    The recent discovery of negative thermal expansion over an unprecedented temperature range in ZrW 2 O 8 (which contracts continuously on warming from below 2 K to above 1000 K) has stimulated considerable interest in this unusual phenomenon. Negative and low thermal expansion materials have a number of important potential uses in ceramic, optical and electronic applications. We have now found negative thermal expansion in a large new family of materials with the general formula A 2 (MO 4 ) 3 . Chemical substitution dramatically influences the thermal expansion properties of these materials allowing the production of ceramics with negative, positive or zero coefficients of thermal expansion, with the potential to control other important materials properties such as refractive index and dielectric constant. The mechanism of negative thermal expansion and the phase transitions exhibited by this important new class of low-expansion materials will be discussed. (orig.)

  20. Pyrolytic 3D Carbon Microelectrodes for Electrochemistry

    DEFF Research Database (Denmark)

    Hemanth, Suhith; Caviglia, Claudia; Amato, Letizia

    2016-01-01

    This work presents the fabrication and characterization of suspended three-dimensional (3D) pyrolytic carbon microelectrodes for electrochemical applications. For this purpose, an optimized process with multiple steps of UV photolithography with the negative tone photoresist SU-8 followed...... by pyrolysis at 900ºC for 1h was developed. With this process, microelectrode chips with a three electrode configuration were fabricated and characterized with cyclic voltammetry (CV) using a 10mM potassium ferri-ferrocyanide redox probe in a custom made batch system with magnetic clamping. The 3D pyrolytic...... carbon microelectrodes displayed twice the higher peak current compared to 2D....

  1. Microring resonator based modulator made by direct photodefinition of an electro-optic polymer

    Science.gov (United States)

    Balakrishnan, M.; Faccini, M.; Diemeer, M. B. J.; Klein, E. J.; Sengo, G.; Driessen, A.; Verboom, W.; Reinhoudt, D. N.

    2008-04-01

    A laterally coupled microring resonator was fabricated by direct photodefinition of negative photoresist SU8, containing tricyanovinylidenediphenylaminobenzene chromophore, by exploiting the low ultraviolet absorption window of this chromophore. The ring resonator was first photodefined by slight cross-linking. Thereafter, poling (to align the chromophores) and further cross-linking (to increase the glass transition temperature) were simultaneously carried out. The material showed excellent photostability and the electro-optic modulation with an r33 of 11pm/V was demonstrated at 10MHz.

  2. Microchip Flow Cytometer with Integrated Polymer Optical Elements for Measurement of Scattered Light

    DEFF Research Database (Denmark)

    Wang, Zhenyu; El-Ali, Jamil; Perch-Nielsen, Ivan Ryberg

    2004-01-01

    channels to form a complete microchip flow cytometer. All the optical elements, the microfluidic system, and the fiber-to-waveguide couplers were defined in one layer of polymer (SU-8, negative photoresist) by standard photolithography. With only one single mask procedure, all the fabrication and packaging...... processes can be finished in one day. Polystyrene beads were measured in the microchip flow cytometer, and three signals (forward scattering, large angle scattering and extinction) were measured simultaneously for each bead. The average intensities of the forward Scattered light and the incident light...

  3. Atomic negative ions

    International Nuclear Information System (INIS)

    Brage, T.

    1991-01-01

    We review some of the recent progress in the studies of alkaline-earth, negative ions. Computations of autodetachment rates, electron affinities and transition wavelengths are discussed and some new and improved results are given

  4. Hybrid UV Lithography for 3D High-Aspect-Ratio Microstructures

    Energy Technology Data Exchange (ETDEWEB)

    Park, Sungmin; Nam, Gyungmok; Kim, Jonghun; Yoon, Sang-Hee [Inha Univ, Incheon (Korea, Republic of)

    2016-08-15

    Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed.

  5. Hybrid UV Lithography for 3D High-Aspect-Ratio Microstructures

    International Nuclear Information System (INIS)

    Park, Sungmin; Nam, Gyungmok; Kim, Jonghun; Yoon, Sang-Hee

    2016-01-01

    Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed

  6. NEGATION AFFIXES IN ENGLISH

    Directory of Open Access Journals (Sweden)

    Dedy Subandowo -

    2017-02-01

    Full Text Available Abstract: This research entitled "Negation Affixes in English". This study is aimed to describe the various negation affixes in English, morphological process, morphophonemic and meaning. The research data were taken from various sources of English grammar book, morphology, research journal and the book which relatees to the research. English grammar books used in this study are written by Otto Jesperson, Marcella Frank, Greenbaum and Geoffrey Leech.  The method used in this research is the descriptive-qualitative method. While the data collection techniques are performed by using jot-down method. And the results of analysis are presented in tabular form and descriptive method. The result of the research shows that English has six types of negative affixes which are categorized by the intensity of its appearance, such as dis-, in-, non-, un-, anti- and -less. Based on the function, negation affixes are divided into several categories such as adjectives, nouns, verbs, and adverbs. The morphophonemic affix in- has four allomorphs, they are in-, im-, il- and ir- . While the analysis revealed that negation affixes have some basic meanings, such as ‘not’, ‘without’, and ‘anti’.

  7. On Various Negative Translations

    Directory of Open Access Journals (Sweden)

    Gilda Ferreira

    2011-01-01

    Full Text Available Several proof translations of classical mathematics into intuitionistic mathematics have been proposed in the literature over the past century. These are normally referred to as negative translations or double-negation translations. Among those, the most commonly cited are translations due to Kolmogorov, Godel, Gentzen, Kuroda and Krivine (in chronological order. In this paper we propose a framework for explaining how these different translations are related to each other. More precisely, we define a notion of a (modular simplification starting from Kolmogorov translation, which leads to a partial order between different negative translations. In this derived ordering, Kuroda and Krivine are minimal elements. Two new minimal translations are introduced, with Godel and Gentzen translations sitting in between Kolmogorov and one of these new translations.

  8. Negative ion sourcery

    International Nuclear Information System (INIS)

    Os, C.F.A. van.

    1989-01-01

    The work described in this thesis is involved by current research programs in the field of nuclear-fusion. A brief introduction to fusion is given, anticipated problems related to current drive of the fusion plasma are pinpointed and probable suggestions to overcome these problems are described. One probable means for current drive is highlighted; Neutral Beam Injection (NBI). This is based on injecting a 1 MeV neutral hydrogen or deuterium beam into a fusion plasma. Negative ions are needed as primary particles because they can easily be neutralized at 1 MeV. The two current schemes for production of negative ions are described, volume production and negative surface ionization. The latter method is extensively studied in this thesis. (author). 171 refs.; 55 figs.; 7 tabs

  9. Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

    KAUST Repository

    Chakrabarty, Souvik; Ouyang, Christine; Krysak, Marie; Trikeriotis, Markos; Cho, Kyoungyoung; Giannelis, Emmanuel P.; Ober, Christopher K.

    2013-01-01

    DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. © 2013 SPIE.

  10. Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

    KAUST Repository

    Chakrabarty, Souvik

    2013-04-01

    DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. © 2013 SPIE.

  11. Loading of Drug-Polymer Matrices in Microreservoirs for Oral Drug Delivery

    DEFF Research Database (Denmark)

    Petersen, Ritika Singh; Keller, Stephan Sylvest; Boisen, Anja

    2017-01-01

    loading in microfabricated DDS. The microfabricated DDS are microcontainers fabricated in photoresist SU-8 and biopolymer poly-L-lactic-acid (PLLA). Furosemide (F) drug is embedded in poly-ε-caprolactone (PCL) polymer matrix. This F-PCL drug polymer matrix is loaded in SU-8 and PLLA microcontainers using...

  12. Dualising Intuitionictic Negation

    Directory of Open Access Journals (Sweden)

    Graham Priest

    2009-01-01

    Full Text Available One of Da Costa's motives when he constructed the paraconsistent logic Cw was to dualise the negation of intuitionistic logic. In this paper I explore a different way of going about this task. A logic is defined by taking the Kripke semantics for intuitionistic logic, and dualising the truth conditions for negation. Various properties of the logic are established, including its relation to CWo Tableau and natural deduction systems for the logic are produced, as are appropriate algebraic structures. The paper then investigates dualising the intuitionistic conditional in the same way. This establishes various connections between the logic, and a logic called in the literature 'Brouwerian logic' or 'closed-set logic'.

  13. Dualising Intuitionistic Negation

    Directory of Open Access Journals (Sweden)

    Graham Priest

    2009-08-01

    Full Text Available One of Da Costa’s motives when he constructed the paraconsistent logic C! was to dualise the negation of intuitionistic logic. In this paper I explore a different way of going about this task. A logic is defined by taking the Kripke semantics for intuitionistic logic, and dualising the truth conditions for negation. Various properties of the logic are established, including its relation to C!. Tableau and natural deduction systems for the logic are produced, as are appropriate algebraic structures. The paper then investigates dualising the intuitionistic conditional in the same way. This establishes various connections between the logic, and a logic called in the literature ‘Brouwerian logic’ or ‘closed-set logic’.

  14. Negative ion beam processes

    International Nuclear Information System (INIS)

    Hayward, T.D.; Lawrence, G.P.; Bentley, R.F.; Malanify, J.J.; Jackson, J.A.

    1975-06-01

    Los Alamos Scientific Laboratory fiscal year 1975 work on production of intense, very bright, negative hydrogen (H - ), ion beams and conversion of a high-energy (a few hundred MeV) negative beam into a neutral beam are described. The ion source work has used a cesium charge exchange source that has produced H - ion beams greater than or equal to 10 mA (about a factor of 10 greater than those available 1 yr ago) with a brightness of 1.4 x 10 9 A/m 2 -rad 2 (about 18 times brighter than before). The high-energy, neutral beam production investigations have included measurements of the 800-MeV H - -stripping cross section in hydrogen gas (sigma/sub -10/, tentatively 4 x 10 -19 cm 2 ), 3- to 6-MeV H - -stripping cross sections in a hydrogen plasma (sigma/sub -10/, tentatively 2 to 4 x 10 -16 cm 2 ), and the small-angle scattering that results from stripping an 800-MeV H - ion beam to a neutral (H 0 ) beam in hydrogen gas. These last measurements were interrupted by the Los Alamos Meson Physics Facility shutdown in December 1974, but should be completed early in fiscal year 1976 when the accelerator resumes operation. Small-angle scattering calculations have included hydrogen gas-stripping, plasma-stripping, and photodetachment. Calculations indicate that the root mean square angular spread of a 390-MeV negative triton (T - ) beam stripped in a plasma stripper may be as low as 0.7 μrad

  15. Negative leave balances

    CERN Multimedia

    Human Resources Department

    2005-01-01

    Members of the personnel entitled to annual leave and, where appropriate, saved leave and/or compensatory leave are requested to take note of the new arrangements described below, which were recommended by the Standing Concertation Committee (SCC) at its meeting on 1Â September 2005 and subsequently approved by the Director-General. The changes do not apply to members of the personnel participating in the Progressive Retirement Programme (PRP) or the Part-time Work as a pre-retirement measure, for whom the specific provisions communicated at the time of joining will continue to apply. Â Negative balances in annual leave, saved leave and/or compensatory leave accounts at the end of the leave year (30th September) and on the date on which bonuses are credited to the saved leave account (31st December): Where members of the personnel have a leave account with a negative balance on 30Â September and/or 31Â December, leave will automatically be transferred from one account to another on the relevant dates i...

  16. Negative leave balances

    CERN Multimedia

    Human Resources Department

    2005-01-01

    Members of the personnel entitled to annual leave and, where appropriate, saved leave and/or compensatory leave are requested to take note of the new arrangements described below, which were recommended by the Standing Concertation Committee (SCC) at its meeting on 1 September 2005 and subsequently approved by the Director-General. The changes do not apply to members of the personnel participating in the Progressive Retirement Programme (PRP) or the Part-time Work as a pre-retirement measure, for whom the specific provisions communicated at the time of joining will continue to apply.  Negative balances in annual leave, saved leave and/or compensatory leave accounts at the end of the leave year (30th September) and on the date on which bonuses are credited to the saved leave account (31st December): Where members of the personnel have a leave account with a negative balance on 30 September and/or 31 December, leave will automatically be transferred from one account to another on the relevant dates in or...

  17. UV-LIGA: From Development to Commercialization

    Directory of Open Access Journals (Sweden)

    Grégoire Genolet

    2014-07-01

    Full Text Available A major breakthrough in UV-LIGA (Lithographie, Galvanoformung and Abformung started with the use of epoxy-based EPON® SU-8 photoresist in the mid-1990s. Using this photoresist has enabled the fabrication of tall and high aspect ratio structures without the use of a very expensive synchrotron source needed to expose the photoresist layer in X-ray LIGA. SU-8 photoresist appeared to be well-suited for LIGA templates, but also as a permanent material. Based on UV-LIGA and SU-8, Mimotec SA has developed processes to manufacture mold inserts and metallic components for various market fields. From one to three-level parts, from Ni to other materials, from simple to complicated parts with integrated functionalities, UV-LIGA has established itself as a manufacturing technology of importance for prototyping, as well as for mass-fabrication. This paper reviews some of the developments that led to commercial success in this field.

  18. Do `negative' temperatures exist?

    Science.gov (United States)

    Lavenda, B. H.

    1999-06-01

    A modification of the second law is required for a system with a bounded density of states and not the introduction of a `negative' temperature scale. The ascending and descending branches of the entropy versus energy curve describe particle and hole states, having thermal equations of state that are given by the Fermi and logistic distributions, respectively. Conservation of energy requires isentropic states to be isothermal. The effect of adiabatically reversing the field is entirely mechanical because the only difference between the two states is their energies. The laws of large and small numbers, leading to the normal and Poisson approximations, characterize statistically the states of infinite and zero temperatures, respectively. Since the heat capacity also vanishes in the state of maximum disorder, the third law can be generalized in systems with a bounded density of states: the entropy tends to a constant as the temperature tends to either zero or infinity.

  19. Exotic dynamically generated baryons with negative charm quantum number

    NARCIS (Netherlands)

    Gamermann, D.; Garcia-Recio, C.; Nieves, J.; Salcedo, L. L.; Tolos, L.

    2010-01-01

    Following a model based on the SU(8) symmetry that treats heavy pseudoscalars and heavy vector mesons on an equal footing, as required by heavy quark symmetry, we study the interaction of baryons and mesons in coupled channels within an unitary approach that generates dynamically poles in the

  20. Lithium alloy negative electrodes

    Science.gov (United States)

    Huggins, Robert A.

    The 1996 announcement by Fuji Photo Film of the development of lithium batteries containing convertible metal oxides has caused a great deal of renewed interest in lithium alloys as alternative materials for use in the negative electrode of rechargeable lithium cells. The earlier work on lithium alloys, both at elevated and ambient temperatures is briefly reviewed. Basic principles relating thermodynamics, phase diagrams and electrochemical properties under near-equilibrium conditions are discussed, with the Li-Sn system as an example. Second-phase nucleation, and its hindrance under dynamic conditions plays an important role in determining deviations from equilibrium behavior. Two general types of composite microstructure electrodes, those with a mixed-conducting matrix, and those with a solid electrolyte matrix, are discussed. The Li-Sn-Si system at elevated temperatures, and the Li-Sn-Cd at ambient temperatures are shown to be examples of mixed-conducting matrix microstructures. The convertible oxides are an example of the solid electrolyte matrix type. Although the reversible capacity can be very large in this case, the first cycle irreversible capacity required to convert the oxides to alloys may be a significant handicap.

  1. Microdosimetry of negative pions

    International Nuclear Information System (INIS)

    Amols, H.I.; Dicello, J.F.; Lane, T.F.

    1976-01-01

    The radiation quality of negative and positive pions of initial momentum 168MeV/c has been determined at eight different depths in a liquid phantom. The measurements were made with a 2.5cm diameter spherical proportional counter with Shonka A-150 neutron tissue equivalent plastic walls. The gas pressure in the sensitive volume was chosen to stimulate a diameter of 2μm in unit density material. Dose distributions as a function of lineal energy change slowly in the entrance and plateau regions with a dose mean lineal energy of 6-8keV/μm. Less than 3% of the dose is delivered in excess of 50keV/μm in this region. In the Bragg peak region the distributions change rapidly as a function of depth with the dose mean lineal energy increasing to 38keV/μm at the peak and to 57keV/μm just beyond the peak. On the basis of these microdosimetric data predictions of RBE and OER have been made with the use of both the theory of dual radiation action and also the delta ray theory of cell survival. The former has been used to predict biological response at low doses and the latter at high doses. A comparison is made between the two theories at intermediate doses. The results of these calculations are not inconsistant with recent biological data

  2. Negative legacy of obesity.

    Directory of Open Access Journals (Sweden)

    Kohsuke Shirakawa

    Full Text Available Obesity promotes excessive inflammation, which is associated with senescence-like changes in visceral adipose tissue (VAT and the development of type 2 diabetes (T2DM and cardiovascular diseases. We have reported that a unique population of CD44hi CD62Llo CD4+ T cells that constitutively express PD-1 and CD153 exhibit cellular senescence and cause VAT inflammation by producing large amounts of osteopontin. Weight loss improves glycemic control and reduces cardiovascular disease risk factors, but its long-term effects on cardiovascular events and longevity in obese individuals with T2DM are somewhat disappointing and not well understood. High-fat diet (HFD-fed obese mice were subjected to weight reduction through a switch to a control diet. They lost body weight and visceral fat mass, reaching the same levels as lean mice fed a control diet. However, the VAT of weight reduction mice exhibited denser infiltration of macrophages, which formed more crown-like structures compared to the VAT of obese mice kept on the HFD. Mechanistically, CD153+ PD-1+ CD4+ T cells are long-lived and not easily eliminated, even after weight reduction. Their continued presence maintains a self-sustaining chronic inflammatory loop via production of large amounts of osteopontin. Thus, we concluded that T-cell senescence is essentially a negative legacy effect of obesity.

  3. Positive Effects of Negative Publicity: When Negative Reviews Increase Sales

    OpenAIRE

    Jonah Berger; Alan T. Sorensen; Scott J. Rasmussen

    2010-01-01

    Can negative information about a product increase sales, and if so, when? Although popular wisdom suggests that "any publicity is good publicity," prior research has demonstrated only downsides to negative press. Negative reviews or word of mouth, for example, have been found to hurt product evaluation and sales. Using a combination of econometric analysis and experimental methods, we unify these perspectives to delineate contexts under which negative publicity about a product will have posit...

  4. Simple Multi-level Microchannel Fabrication by Pseudo-Grayscale Backside Diffused Light Lithography.

    Science.gov (United States)

    Lai, David; Labuz, Joseph M; Kim, Jiwon; Luker, Gary D; Shikanov, Ariella; Takayama, Shuichi

    2013-11-14

    Photolithography of multi-level channel features in microfluidics is laborious and/or costly. Grayscale photolithography is mostly used with positive photoresists and conventional front side exposure, but the grayscale masks needed are generally costly and positive photoresists are not commonly used in microfluidic rapid prototyping. Here we introduce a simple and inexpensive alternative that uses pseudo-grayscale (pGS) photomasks in combination with backside diffused light lithography (BDLL) and the commonly used negative photoresist, SU-8. BDLL can produce smooth multi-level channels of gradually changing heights without use of true grayscale masks because of the use of diffused light. Since the exposure is done through a glass slide, the photoresist is cross-linked from the substrate side up enabling well-defined and stable structures to be fabricated from even unspun photoresist layers. In addition to providing unique structures and capabilities, the method is compatible with the "garage microfluidics" concept of creating useful tools at low cost since pGS BDLL can be performed with the use of only hot plates and a UV transilluminator: equipment commonly found in biology labs. Expensive spin coaters or collimated UV aligners are not needed. To demonstrate the applicability of pGS BDLL, a variety of weir-type cell traps were constructed with a single UV exposure to separate cancer cells (MDA-MB-231, 10-15 μm in size) from red blood cells (RBCs, 2-8 μm in size) as well as follicle clusters (40-50 μm in size) from cancer cells (MDA-MB-231, 10-15 μm in size).

  5. Negative dimensional integrals. Pt. 1

    International Nuclear Information System (INIS)

    Halliday, I.G.; Ricotta, R.M.

    1987-01-01

    We propose a new method of evaluating integrals based on negative dimensional integration. We compute Feynman graphs by considering analytic extensions. Propagators are raised to negative integer powers and integrated over negative integer dimensions. We are left with the problem of computing polynomial integrals and summing finite series. (orig.)

  6. Negative chemical ionization mass spectrometry

    International Nuclear Information System (INIS)

    Smit, A.L.C.

    1979-01-01

    This thesis describes some aspects of Negative Chemical Ionization (NCI) mass spectrometry. The reasons for the growing interest in NCI are: (i) to extend the basic knowledge of negative ions and their reactions in the gas phase; (ii) to investigate whether or not this knowledge of negative ions can be used successfully to elucidate the structure of molecules by mass spectrometry. (Auth.)

  7. Thermodynamics of negative absolute pressures

    International Nuclear Information System (INIS)

    Lukacs, B.; Martinas, K.

    1984-03-01

    The authors show that the possibility of negative absolute pressure can be incorporated into the axiomatic thermodynamics, analogously to the negative absolute temperature. There are examples for such systems (GUT, QCD) processing negative absolute pressure in such domains where it can be expected from thermodynamical considerations. (author)

  8. Nanomechanical Pyrolytic Carbon Resonators: Novel Fabrication Method and Characterization of Mechanical Properties

    Directory of Open Access Journals (Sweden)

    Maksymilian Kurek

    2016-07-01

    Full Text Available Micro- and nanomechanical string resonators, which essentially are highly stressed bridges, are of particular interest for micro- and nanomechanical sensing because they exhibit resonant behavior with exceptionally high quality factors. Here, we fabricated and characterized nanomechanical pyrolytic carbon resonators (strings and cantilevers obtained through pyrolysis of photoresist precursors. The developed fabrication process consists of only three processing steps: photolithography, dry etching and pyrolysis. Two different fabrication strategies with two different photoresists, namely SU-8 2005 (negative and AZ 5214e (positive, were compared. The resonant behavior of the pyrolytic resonators was characterized at room temperature and in high vacuum using a laser Doppler vibrometer. The experimental data was used to estimate the Young’s modulus of pyrolytic carbon and the tensile stress in the string resonators. The Young’s moduli were calculated to be 74 ± 8 GPa with SU-8 and 115 ± 8 GPa with AZ 5214e as the precursor. The tensile stress in the string resonators was 33 ± 7 MPa with AZ 5214e as the precursor. The string resonators displayed maximal quality factor values of up to 3000 for 525-µm-long structures.

  9. Negative snakes in JET: evidence for negative shear

    Energy Technology Data Exchange (ETDEWEB)

    Gill, R D; Alper, B; Edwards, A W [Commission of the European Communities, Abingdon (United Kingdom). JET Joint Undertaking; Pearson, D [Reading Univ. (United Kingdom)

    1994-07-01

    The signature of the negative snakes from the soft X-ray cameras is very similar to the more usual snakes except that the localised region of the snake has, compared with its surroundings, decreased rather than increased emission. Circumstances where negative snakes have been seen are reviewed. The negative snake appears as a region of increased resistance and of increased impurity density. The relationship between the shear and the current perturbation is shown, and it seem probable that the magnetic shear is reversed at the point of the negative snake, i.e. that q is decreasing with radius. 6 refs., 6 figs.

  10. Negative snakes in JET: evidence for negative shear

    International Nuclear Information System (INIS)

    Gill, R.D.; Alper, B.; Edwards, A.W.

    1994-01-01

    The signature of the negative snakes from the soft X-ray cameras is very similar to the more usual snakes except that the localised region of the snake has, compared with its surroundings, decreased rather than increased emission. Circumstances where negative snakes have been seen are reviewed. The negative snake appears as a region of increased resistance and of increased impurity density. The relationship between the shear and the current perturbation is shown, and it seem probable that the magnetic shear is reversed at the point of the negative snake, i.e. that q is decreasing with radius. 6 refs., 6 figs

  11. Negative Attitudes, Network and Education

    DEFF Research Database (Denmark)

    Bennett, Patrick; la Cour, Lisbeth; Larsen, Birthe

    We consider the impact of negative attitudes against immigrants and immigration on educational choice in a search and wage bargaining model including networking. We consider two cases in terms of the importance of negative attitudes againts immigrants for high and low educated individuals and find...... that more negative attitudes against immigrants has a positive impact on education in one case and a negative impact in the other and has no impact on natives. Immigration improves employment perspectives for immigrants and thereby increases immigrant education whereas endogenous negative attitudes lead...... use Danish register data to find a signficant positive correlation between negative attitudes towards immigrants and high school attendance and find a positive impact of networking on high school attendance. In both the macro and the micro-econometric analysis we run the same regressions for natives...

  12. Negative hydrogen ion production mechanisms

    Energy Technology Data Exchange (ETDEWEB)

    Bacal, M. [UPMC, LPP, Ecole Polytechnique, UMR CNRS 7648, Palaiseau (France); Wada, M. [School of Science and Engineering, Doshisha University, Kyoto 610-0321 (Japan)

    2015-06-15

    Negative hydrogen/deuterium ions can be formed by processes occurring in the plasma volume and on surfaces facing the plasma. The principal mechanisms leading to the formation of these negative ions are dissociative electron attachment to ro-vibrationally excited hydrogen/deuterium molecules when the reaction takes place in the plasma volume, and the direct electron transfer from the low work function metal surface to the hydrogen/deuterium atoms when formation occurs on the surface. The existing theoretical models and reported experimental results on these two mechanisms are summarized. Performance of the negative hydrogen/deuterium ion sources that emerged from studies of these mechanisms is reviewed. Contemporary negative ion sources do not have negative ion production electrodes of original surface type sources but are operated with caesium with their structures nearly identical to volume production type sources. Reasons for enhanced negative ion current due to caesium addition to these sources are discussed.

  13. Wages, Amenities and Negative Attitudes

    DEFF Research Database (Denmark)

    Waisman, Gisela; Larsen, Birthe

    We exploit the regional variation in negative attitudes towards immigrants to Sweden in order to analyse the consequences of the attitudes on immigrants welfare. We find that attitudes towards immigrants are of importance: they both affect their labour market outcomes and their quality of life. We...... interpret the negative effect on wages as evidence of labour market discrimination. We estimate the welfare effects of negative attitudes, through their wage and local amenities, for immigrants with different levels of skills, origin, gender and age....

  14. Income, Amenities and Negative Attitudes

    DEFF Research Database (Denmark)

    Waisman, Gisela; Larsen, Birthe

    2016-01-01

    We exploit the regional variation in negative attitudes towards immigrants to Sweden in order to analyse the consequences of negative attitudes on refugees’ utility from labour income and amenities. We find that attitudes towards immigrants are important: while they affect mainly the refugees......’ quality of life, they also affect their income. We estimate the utility effects of negative attitudes for refugees with different levels of education and gender. We also analyse how the size of the refugees’ networks relate to their quality of life and income as well as how negative attitudes towards...

  15. Isotropic Negative Thermal Expansion Metamaterials.

    Science.gov (United States)

    Wu, Lingling; Li, Bo; Zhou, Ji

    2016-07-13

    Negative thermal expansion materials are important and desirable in science and engineering applications. However, natural materials with isotropic negative thermal expansion are rare and usually unsatisfied in performance. Here, we propose a novel method to achieve two- and three-dimensional negative thermal expansion metamaterials via antichiral structures. The two-dimensional metamaterial is constructed with unit cells that combine bimaterial strips and antichiral structures, while the three-dimensional metamaterial is fabricated by a multimaterial 3D printing process. Both experimental and simulation results display isotropic negative thermal expansion property of the samples. The effective coefficient of negative thermal expansion of the proposed models is demonstrated to be dependent on the difference between the thermal expansion coefficient of the component materials, as well as on the circular node radius and the ligament length in the antichiral structures. The measured value of the linear negative thermal expansion coefficient of the three-dimensional sample is among the largest achieved in experiments to date. Our findings provide an easy and practical approach to obtaining materials with tunable negative thermal expansion on any scale.

  16. Negative Attitudes, Network and Education

    DEFF Research Database (Denmark)

    Bennett, Patrick; la Cour, Lisbeth; Larsen, Birthe

    , the impact of negative attitudes and networking taking into account that these parameters may influence high and uneducated workers as well as immigrants and natives differently, creating different incentives to acquire education for the two ethnic groups. Using rich Danish administrative data, this paper......This paper explores potential explanations behind the educational gap between young natives and immigrants using two measures, negative attitudes towards immigrants and networking, which may influence natives and immigrants differently. The paper considers, both theoretically and empirically...... finds evidence that greater negative attitudes increase incentives for males to acquire education and that networking also increases immigrant education....

  17. Recent negative ion source developments

    International Nuclear Information System (INIS)

    Alton, G.D.

    1978-01-01

    This report describes recent results obtained from studies associated with the development of negative ion sources which utilize sputtering in a diffuse cesium plasma as a means of ion beam generation. Data are presented which relate negative ion yield and important operational parameters such as cesium oven temperature and sputter probe voltage from each of the following sources: (1) A source based in principle according to the University of Aarhus design and (2) an axial geometry source. The important design aspects of the sources are given--along with a list of the negative ion intensities observed to date. Also a qualitative description and interpretation of the negative ion generation mechanism in sources which utilize sputtering in the presence of cesium is given

  18. Ferroelectric Negative Capacitance Domain Dynamics

    OpenAIRE

    Hoffmann, Michael; Khan, Asif Islam; Serrao, Claudy; Lu, Zhongyuan; Salahuddin, Sayeef; Pešić, Milan; Slesazeck, Stefan; Schroeder, Uwe; Mikolajick, Thomas

    2017-01-01

    Transient negative capacitance effects in epitaxial ferroelectric Pb(Zr$_{0.2}$Ti$_{0.8}$)O$_3$ capacitors are investigated with a focus on the dynamical switching behavior governed by domain nucleation and growth. Voltage pulses are applied to a series connection of the ferroelectric capacitor and a resistor to directly measure the ferroelectric negative capacitance during switching. A time-dependent Ginzburg-Landau approach is used to investigate the underlying domain dynamics. The transien...

  19. Negative magnetic relaxation in superconductors

    Directory of Open Access Journals (Sweden)

    Krasnoperov E.P.

    2013-01-01

    Full Text Available It was observed that the trapped magnetic moment of HTS tablets or annuli increases in time (negative relaxation if they are not completely magnetized by a pulsed magnetic field. It is shown, in the framework of the Bean critical-state model, that the radial temperature gradient appearing in tablets or annuli during a pulsed field magnetization can explain the negative magnetic relaxation in the superconductor.

  20. SM-1 negative ion source

    International Nuclear Information System (INIS)

    Huang Zhenjun; Wang Jianzhen

    1987-01-01

    The working principle and characteristics of SM-1 Negative Ion Source is mainly introduced. In the instrument, there is a device to remove O 3 . This instrument can keep high density of negative ions which is generated by the electrical coronas setting out electricity at negative high voltage and can remove the O 3 component which is harmful to the human body. The density of negative ions is higher than 2.5 x 10 6 p./cm 3 while that of O 3 components is less than 1 ppb at the distance of 50 cm from the panel of the instrument. The instrument sprays negative ions automatically without the help of electric fan, so it works noiselessly. It is widely used in national defence, industry, agriculture, forestry, stock raising, sidelines and in the places with an equipment of low density of negative ion or high concentration of O 3 components. Besides, the instrument may also be used to treat diseases, to prevent against rot, to arrest bacteria, to purify air and so on

  1. Ferroelectric negative capacitance domain dynamics

    Science.gov (United States)

    Hoffmann, Michael; Khan, Asif Islam; Serrao, Claudy; Lu, Zhongyuan; Salahuddin, Sayeef; Pešić, Milan; Slesazeck, Stefan; Schroeder, Uwe; Mikolajick, Thomas

    2018-05-01

    Transient negative capacitance effects in epitaxial ferroelectric Pb(Zr0.2Ti0.8)O3 capacitors are investigated with a focus on the dynamical switching behavior governed by domain nucleation and growth. Voltage pulses are applied to a series connection of the ferroelectric capacitor and a resistor to directly measure the ferroelectric negative capacitance during switching. A time-dependent Ginzburg-Landau approach is used to investigate the underlying domain dynamics. The transient negative capacitance is shown to originate from reverse domain nucleation and unrestricted domain growth. However, with the onset of domain coalescence, the capacitance becomes positive again. The persistence of the negative capacitance state is therefore limited by the speed of domain wall motion. By changing the applied electric field, capacitor area or external resistance, this domain wall velocity can be varied predictably over several orders of magnitude. Additionally, detailed insights into the intrinsic material properties of the ferroelectric are obtainable through these measurements. A new method for reliable extraction of the average negative capacitance of the ferroelectric is presented. Furthermore, a simple analytical model is developed, which accurately describes the negative capacitance transient time as a function of the material properties and the experimental boundary conditions.

  2. Nanoporous Silica Templated HeteroEpitaxy: Final LDRD Report.

    Energy Technology Data Exchange (ETDEWEB)

    Burckel, David Bruce; Koleske, Daniel; Rowen, Adam M.; Williams, John Dalton; Fan, Hongyou; Arrington, Christian Lew

    2006-11-01

    This one-year out-of-the-box LDRD was focused on exploring the use of porous growth masks as a method for defect reduction during heteroepitaxial crystal growth. Initially our goal was to investigate porous silica as a growth mask, however, we expanded the scope of the research to include several other porous growth masks on various size scales, including mesoporous carbon, and the UV curable epoxy, SU-8. Use of SU-8 as a growth mask represents a new direction, unique in the extensive literature of patterned epitaxial growth, and presents the possibility of providing a single step growth mask. Additional research included investigation of pore viability via electrochemical deposition into high aspect ratio photoresist patterns and pilot work on using SU-8 as a DUV negative resist, another significant potential result. While the late start nature of this project pushed some of the initial research goals out of the time table, significant progress was made. 3 Acknowledgements This work was performed in part at the Nanoscience @ UNM facility, a member of the National Nanotechnology Infrastructure Network, which is supported by the National Science Foundation (Grant ECS 03-35765). Sandia is multiprogram laboratory operated by Sandia Corporation, a Lockheed Martin Company, for the United Stated Department of Energy's National Nuclear Security Administration under Contract DE-AC04-94AL85000. This work was supported under the Sandia LDRD program (Project 99405). 4

  3. Quantum entanglement at negative temperature

    International Nuclear Information System (INIS)

    Furman, G B; Meerovich, V M; Sokolovsky, V L

    2013-01-01

    An isolated spin system that is in internal thermodynamic equilibrium and that has an upper limit to its allowed energy states can possess a negative temperature. We calculate the thermodynamic characteristics and the concurrence in this system over the entire range of positive and negative temperatures. Our calculation was performed for different real structures, which can be used in experiments. It is found that the temperature dependence of the concurrence is substantially asymmetrical similarly to other thermodynamic characteristics. At a negative temperature the maximum concurrence and the absolute temperature of the entanglement appearance are significantly larger than those at a positive temperature. The concurrence can be characterized by two dimensionless parameters: the ratio between the Zeeman and dipolar energies and the ratio of the thermal and dipolar energies. It was shown that for all considered structures the dimensionless temperatures of the transition between entanglement and separability of the first and second spins are independent of spin structure and the number of spins. (paper)

  4. Negativity Bias in Dangerous Drivers.

    Directory of Open Access Journals (Sweden)

    Jing Chai

    Full Text Available The behavioral and cognitive characteristics of dangerous drivers differ significantly from those of safe drivers. However, differences in emotional information processing have seldom been investigated. Previous studies have revealed that drivers with higher anger/anxiety trait scores are more likely to be involved in crashes and that individuals with higher anger traits exhibit stronger negativity biases when processing emotions compared with control groups. However, researchers have not explored the relationship between emotional information processing and driving behavior. In this study, we examined the emotional information processing differences between dangerous drivers and safe drivers. Thirty-eight non-professional drivers were divided into two groups according to the penalty points that they had accrued for traffic violations: 15 drivers with 6 or more points were included in the dangerous driver group, and 23 drivers with 3 or fewer points were included in the safe driver group. The emotional Stroop task was used to measure negativity biases, and both behavioral and electroencephalograph data were recorded. The behavioral results revealed stronger negativity biases in the dangerous drivers than in the safe drivers. The bias score was correlated with self-reported dangerous driving behavior. Drivers with strong negativity biases reported having been involved in mores crashes compared with the less-biased drivers. The event-related potentials (ERPs revealed that the dangerous drivers exhibited reduced P3 components when responding to negative stimuli, suggesting decreased inhibitory control of information that is task-irrelevant but emotionally salient. The influence of negativity bias provides one possible explanation of the effects of individual differences on dangerous driving behavior and traffic crashes.

  5. Negative Attitudes, Networks and Education

    DEFF Research Database (Denmark)

    Bennett, Patrick; la Cour, Lisbeth; Larsen, Birthe

    This paper theoretically and empirically assesses the potential explanations behind the educational gap between young natives and immigrants using two measures, negative attitudes towards immigrants and networking. The paper considers that two these parameters may influence high and uneducated...... workers as well as immigrants and natives differently, creating different incentives to acquire education for the two groups. Using rich Danish administrative data, this paper finds suggestive evidence rejecting the theoretical case where negative attitudes decrease 1st generation immigrant education...... and indications that quality of networks seems to matter more for immigrants than the quantity of individuals in a potential network....

  6. Patch Test Negative Generalized Dermatitis.

    Science.gov (United States)

    Spiker, Alison; Mowad, Christen

    2016-01-01

    Allergic contact dermatitis is a common condition in dermatology. Patch testing is the criterion standard for diagnosis. However, dermatitis is not always caused by an allergen, and patch testing does not identify a culprit in every patient. Generalized dermatitis, defined as eczematous dermatitis affecting greater than 3 body sites, is often encountered in dermatology practice, especially patch test referral centers. Management for patients with generalized dermatitis who are patch test negative is challenging. The purpose of this article is to outline an approach to this challenging scenario and summarize the paucity of existing literature on patch test negative generalized dermatitis.

  7. Dielectric properties of ligand-modified gold nanoparticles/SU-8 photopolymer based nanocomposites

    KAUST Repository

    Toor, Anju; So, Hongyun; Pisano, Albert P.

    2017-01-01

    This article reports the enhanced dielectric properties of a photodefinable nanocomposite material containing sub–10 nm coated metal nanoparticles (NPs). The surface morphology of the synthesized dodecanethiol-functionalized gold NPs was characterized using the transmission electron microscopy (TEM). We investigated the particle agglomeration and dispersion during the various stages of the nanocomposite synthesis using TEM. Physical properties such as dielectric permittivity and dielectric loss were measured experimentally. The dependence of dielectric permittivity and loss tangent on particle concentration and frequency was studied. Nanocomposite films showed an approximately three times enhancement in average dielectric constant over the polymer base value and an average dielectric loss of 0.09 at 1 kHz, at a filler loading of 10% w/w.

  8. Simulation of a low frequency Z-axis SU-8 accelerometer in coventorware and MEMS+

    KAUST Repository

    Carreno, Armando Arpys Arevalo; Conchouso Gonzalez, David; Zaher, Amir Omar; Foulds, Ian G.; Kosel, Jü rgen

    2013-01-01

    calculation, and a comparison of results achieved using CoventorWare® ANALYZER™ and MEMS+®. A fabricated energy harvester design from [1] was used for modeling and simulation in this study, with a four spring attachment of a 650μm×650μm; ×110μm proof mass of 4.542

  9. Dielectric properties of ligand-modified gold nanoparticles/SU-8 photopolymer based nanocomposites

    KAUST Repository

    Toor, Anju

    2017-04-15

    This article reports the enhanced dielectric properties of a photodefinable nanocomposite material containing sub–10 nm coated metal nanoparticles (NPs). The surface morphology of the synthesized dodecanethiol-functionalized gold NPs was characterized using the transmission electron microscopy (TEM). We investigated the particle agglomeration and dispersion during the various stages of the nanocomposite synthesis using TEM. Physical properties such as dielectric permittivity and dielectric loss were measured experimentally. The dependence of dielectric permittivity and loss tangent on particle concentration and frequency was studied. Nanocomposite films showed an approximately three times enhancement in average dielectric constant over the polymer base value and an average dielectric loss of 0.09 at 1 kHz, at a filler loading of 10% w/w.

  10. A Multimodal, SU-8 - Platinum - Polyimide Microelectrode Array for Chronic In Vivo Neurophysiology.

    Directory of Open Access Journals (Sweden)

    Gergely Márton

    Full Text Available Utilization of polymers as insulator and bulk materials of microelectrode arrays (MEAs makes the realization of flexible, biocompatible sensors possible, which are suitable for various neurophysiological experiments such as in vivo detection of local field potential changes on the surface of the neocortex or unit activities within the brain tissue. In this paper the microfabrication of a novel, all-flexible, polymer-based MEA is presented. The device consists of a three dimensional sensor configuration with an implantable depth electrode array and brain surface electrodes, allowing the recording of electrocorticographic (ECoG signals with laminar ones, simultaneously. In vivo recordings were performed in anesthetized rat brain to test the functionality of the device under both acute and chronic conditions. The ECoG electrodes recorded slow-wave thalamocortical oscillations, while the implanted component provided high quality depth recordings. The implants remained viable for detecting action potentials of individual neurons for at least 15 weeks.

  11. Molybdenum coated SU-8 microneedle electrodes for transcutaneous electrical nerve stimulation.

    Science.gov (United States)

    Soltanzadeh, Ramin; Afsharipour, Elnaz; Shafai, Cyrus; Anssari, Neda; Mansouri, Behzad; Moussavi, Zahra

    2017-11-21

    Electrophysiological devices are connected to the body through electrodes. In some applications, such as nerve stimulation, it is needed to minimally pierce the skin and reach the underneath layers to bypass the impedance of the first layer called stratum corneum. In this study, we have designed and fabricated surface microneedle electrodes for applications such as electrical peripheral nerve stimulation. We used molybdenum for microneedle fabrication, which is a biocompatible metal; it was used for the conductive layer of the needle array. To evaluate the performance of the fabricated electrodes, they were compared with the conventional surface electrodes in nerve conduction velocity experiment. The recorded signals showed a much lower contact resistance and higher bandwidth in low frequencies for the fabricated microneedle electrodes compared to those of the conventional electrodes. These results indicate the electrode-tissue interface capacitance and charge transfer resistance have been increased in our designed electrodes, while the contact resistance decreased. These changes will lead to less harmful Faradaic current passing through the tissue during stimulation in different frequencies. We also compared the designed microneedle electrodes with conventional ones by a 3-dimensional finite element simulation. The results demonstrated that the current density in the deep layers of the skin and the directivity toward a target nerve for microneedle electrodes were much more than those for the conventional ones. Therefore, the designed electrodes are much more efficient than the conventional electrodes for superficial transcutaneous nerve stimulation purposes.

  12. Negative energy solutions and symmetries

    International Nuclear Information System (INIS)

    Sidharth, B.G.

    2011-01-01

    We revisit the negative energy solutions of the Dirac (and Klein–Gordon) equation, which become relevant at very high energies in the context of the Feshbach–Villars formulation, and study several symmetries which follow therefrom. Significant consequences are briefly examined. (author)

  13. Symmetric relations of finite negativity

    NARCIS (Netherlands)

    Kaltenbaeck, M.; Winkler, H.; Woracek, H.; Forster, KH; Jonas, P; Langer, H

    2006-01-01

    We construct and investigate a space which is related to a symmetric linear relation S of finite negativity on an almost Pontryagin space. This space is the indefinite generalization of the completion of dom S with respect to (S.,.) for a strictly positive S on a Hilbert space.

  14. Production of negative helium ions

    International Nuclear Information System (INIS)

    Toledo, A.S. de; Sala, O.

    1977-01-01

    A negative helium ion source using potassium charge exchange vapor has been developed to be used as an injector for the Pelletron accelerator. 3 He and α beam currents of up to 2μA have been extracted with 75% particle transmission through the machine [pt

  15. Unimode metamaterials exhibiting negative linear compressibility and negative thermal expansion

    International Nuclear Information System (INIS)

    Dudek, Krzysztof K; Attard, Daphne; Caruana-Gauci, Roberto; Grima, Joseph N; Wojciechowski, Krzysztof W

    2016-01-01

    Unimode metamaterials made from rotating rigid triangles are analysed mathematically for their mechanical and thermal expansion properties. It is shown that these unimode systems exhibit positive Poisson’s ratios irrespective of size, shape and angle of aperture, with the Poisson’s ratio exhibiting giant values for certain conformations. When the Poisson’s ratio in one loading direction is larger than +1, the systems were found to exhibit the anomalous property of negative linear compressibility along this direction, that is, the systems expand in this direction when hydrostatically compressed. Also discussed are the thermal expansion properties of these systems under the assumption that the units exhibit increased rotational agitation once subjected to an increase in temperature. The effect of the geometric parameters on the aforementioned thermo-mechanical properties of the system, are discussed, with the aim of identifying negative behaviour. (paper)

  16. Topography printing to locally control wettability.

    Science.gov (United States)

    Zheng, Zijian; Azzaroni, Omar; Zhou, Feng; Huck, Wilhelm T S

    2006-06-21

    This paper reports a new patterning method, which utilizes NaOH to facilitate the irreversible binding between the PDMS stamp and substrates and subsequent cohesive mechanical failure to transfer the PDMS patterns. Our method shows high substrate tolerance and can be used to "print" various PDMS geometries on a wide range of surfaces, including Si100, glass, gold, polymers, and patterned SU8 photoresist. Using this technique, we are able to locally change the wettability of substrate surfaces by printing well-defined PDMS architectures on the patterned SU8 photoresist. It is possible to generate differential wetting and dewetting properties in microchannels and in the PDMS printed area, respectively.

  17. Negation switching invariant signed graphs

    Directory of Open Access Journals (Sweden)

    Deepa Sinha

    2014-04-01

    Full Text Available A signed graph (or, $sigraph$ in short is a graph G in which each edge x carries a value $\\sigma(x \\in \\{-, +\\}$ called its sign. Given a sigraph S, the negation $\\eta(S$ of the sigraph S is a sigraph obtained from S by reversing the sign of every edge of S. Two sigraphs $S_{1}$ and $S_{2}$ on the same underlying graph are switching equivalent if it is possible to assign signs `+' (`plus' or `-' (`minus' to vertices of $S_{1}$ such that by reversing the sign of each of its edges that has received opposite signs at its ends, one obtains $S_{2}$. In this paper, we characterize sigraphs which are negation switching invariant and also see for what sigraphs, S and $\\eta (S$ are signed isomorphic.

  18. Incisional Negative Pressure Wound Therapy

    DEFF Research Database (Denmark)

    Hyldig, Nana

    the rate of surgical wound infection and wound exudate post-caesarean and that wound infection had a negative impact on quality of life one month after surgery. Alongside the clinical trial, a trial-based cost-effectiveness analysis demonstrated that the treatment is cost-effective in a high......Women with a pre-gestational body mass index (BMI) above 30 kg/m2 giving birth by caesarean section are at high risk of surgical wound infection compared with women with a BMI below 30 kg/m2. Incisional Negative Pressure Wound Therapy (iNPWT) is one strategy to reduce the rate of surgical wound...... a randomised controlled trial in two tertiary and three teaching hospitals in three regions of Denmark, the Happy Belly Study, investigating the effectiveness of iNPWT in a population of obese women after caesarean section. The Happy Belly Study has demonstrated that prophylactic iNPWT significantly reduced...

  19. Perfect antireflection via negative refraction

    International Nuclear Information System (INIS)

    Monzon, Juan J.; Barriuso, Alberto G.; Sanchez-Soto, Luis L.

    2006-01-01

    We suggest a geometrical framework to discuss the action of slabs of negatively refracting materials. We show that these slabs generate the same orbits as normal materials, but traced out in opposite directions. This property allows us to confirm that the action of any lossless multilayer can be optically canceled by putting it together with the multilayer constructed as the inverted mirror image, with ε and μ reversed in sign

  20. Negative ion detachment cross sections

    International Nuclear Information System (INIS)

    Champion, R.L.; Doverspike, L.D.

    1992-10-01

    The authors have measured absolute cross sections for electron detachment and charge exchange for collision of O and S with atomic hydrogen, have investigated the sputtering and photodesorption of negative ions from gas covered surfaces, and have begun an investigation of photon-induced field emission of electrons from exotic structures. Brief descriptions of these activities as well as future plans for these projects are given below

  1. Weak negation in inquisitive semantics

    Czech Academy of Sciences Publication Activity Database

    Punčochář, Vít

    2015-01-01

    Roč. 24, č. 3 (2015), s. 323-355 ISSN 0925-8531 R&D Projects: GA ČR(CZ) GA13-21076S Institutional support: RVO:67985955 Keywords : inquisitive semantics * negation * possible worlds * Fitch-style natural deduction * denial Subject RIV: AA - Philosophy ; Religion Impact factor: 0.450, year: 2015 http://link.springer.com/article/10.1007%2Fs10849-015-9219-2

  2. Negative-Pressure Pulmonary Edema.

    Science.gov (United States)

    Bhattacharya, Mallar; Kallet, Richard H; Ware, Lorraine B; Matthay, Michael A

    2016-10-01

    Negative-pressure pulmonary edema (NPPE) or postobstructive pulmonary edema is a well-described cause of acute respiratory failure that occurs after intense inspiratory effort against an obstructed airway, usually from upper airway infection, tumor, or laryngospasm. Patients with NPPE generate very negative airway pressures, which augment transvascular fluid filtration and precipitate interstitial and alveolar edema. Pulmonary edema fluid collected from most patients with NPPE has a low protein concentration, suggesting hydrostatic forces as the primary mechanism for the pathogenesis of NPPE. Supportive care should be directed at relieving the upper airway obstruction by endotracheal intubation or cricothyroidotomy, institution of lung-protective positive-pressure ventilation, and diuresis unless the patient is in shock. Resolution of the pulmonary edema is usually rapid, in part because alveolar fluid clearance mechanisms are intact. In this review, we discuss the clinical presentation, pathophysiology, and management of negative-pressure or postobstructive pulmonary edema. Copyright © 2016 American College of Chest Physicians. Published by Elsevier Inc. All rights reserved.

  3. Hybrid Quantum Cascade Lasers on Silicon-on-Sapphire

    Science.gov (United States)

    2016-11-23

    platforms have undergone a tremendous expansion in recent years, driven initially by applications in fiber - optics communications and optical ...Figure 1. The epi-transfer procedure. (a) A fully-processed QCL on InP. (b) Supporting elements made of SU-8 photoresist epoxy are formed via optical ...removed via selective etching . (e) The QCL is bonded to a Si substrate with the SU-8 epoxy adhesive. (f) The glass slide and the Crystalbond glue is

  4. Perfect imaging without negative refraction

    OpenAIRE

    Leonhardt, Ulf

    2009-01-01

    Perfect imaging has been believed to rely on negative refraction, but here we show that an ordinary positively-refracting optical medium may form perfect images as well. In particular, we establish a mathematical proof that Maxwell's fish eye in two-dimensional integrated optics makes a perfect instrument with a resolution not limited by the wavelength of light. We also show how to modify the fish eye such that perfect imaging devices can be made in practice. Our method of perfect focusing ma...

  5. Perfect imaging without negative refraction

    Energy Technology Data Exchange (ETDEWEB)

    Leonhardt, Ulf [School of Physics and Astronomy, University of St Andrews, North Haugh, St Andrews KY16 9SS (United Kingdom)], E-mail: ulf@st-andrews.ac.uk

    2009-09-15

    Perfect imaging has been believed to rely on negative refraction, but here we show that an ordinary positively refracting optical medium may form perfect images as well. In particular, we establish a mathematical proof that Maxwell's fish eye in two-dimensional (2D) integrated optics makes a perfect instrument with a resolution not limited by the wavelength of light. We also show how to modify the fish eye such that perfect imaging devices can be made in practice. Our method of perfect focusing may also find applications outside of optics, in acoustics, fluid mechanics or quantum physics, wherever waves obey the 2D Helmholtz equation.

  6. Imagery mismatch negativity in musicians.

    Science.gov (United States)

    Herholz, Sibylle C; Lappe, Claudia; Knief, Arne; Pantev, Christo

    2009-07-01

    The present study investigated musical imagery in musicians and nonmusicians by means of magnetoencephalography (MEG). We used a new paradigm in which subjects had to continue familiar melodies in their mind and then judged if a further presented tone was a correct continuation of the melody. Incorrect tones elicited an imagery mismatch negativity (iMMN) in musicians but not in nonmusicians. This finding suggests that the MMN component can be based on an imagined instead of a sensory memory trace and that imagery of music is modulated by musical expertise.

  7. Negative mass solitons in gravity

    International Nuclear Information System (INIS)

    Cebeci, Hakan; Sarioglu, Oezguer; Tekin, Bayram

    2006-01-01

    We first reconstruct the conserved (Abbott-Deser) charges in the spin-connection formalism of gravity for asymptotically (Anti)-de Sitter spaces, and then compute the masses of the AdS soliton and the recently found Eguchi-Hanson solitons in generic odd dimensions, unlike the previous result obtained for only five dimensions. These solutions have negative masses compared to the global AdS or AdS/Z p spacetimes. As a separate note, we also compute the masses of the recent even dimensional Taub-NUT-Reissner-Nordstroem metrics

  8. Combinatorial process optimization for negative photo-imageable spin-on dielectrics and investigation of post-apply bake and post-exposure bake interactions

    Science.gov (United States)

    Kim, Jihoon; Zhang, Ruzhi M.; Wolfer, Elizabeth; Patel, Bharatkumar K.; Toukhy, Medhat; Bogusz, Zachary; Nagahara, Tatsuro

    2012-03-01

    Patternable dielectric materials were developed and introduced to reduce semiconductor manufacturing complexity and cost of ownership (CoO). However, the bestowed dual functionalities of photo-imageable spin-on dielectrics (PSOD) put great challenges on the material design and development. In this work, we investigated the combinatorial process optimization for the negative-tone PSOD lithography by employing the Temperature Gradient Plate (TGP) technique which significantly reduced the numbers of wafers processed and minimized the developmental time. We demonstrated that this TGP combinatorial is very efficient at evaluating the effects and interactions of several independent variables such as post-apply bake (PAB) and post-exposure bake (PEB). Unlike most of the conventional photoresists, PAB turned out to have a great effect on the PSOD pattern profiles. Based on our extensive investigation, we observed great correlation between PAB and PEB processes. In this paper, we will discuss the variation of pattern profiles as a matrix of PAB and PEB and propose two possible cross-linking mechanisms for the PSOD materials to explain the unusual experimental results.

  9. Optimization of negative ion accelerators

    International Nuclear Information System (INIS)

    Pamela, J.

    1991-01-01

    We have started to study negative ion extraction and acceleration systems in view of designing a 1 MeV D - accelerator. This study is being made with a two-Dimensional code that has been specifically developed in our laboratory and validated by comparison to three sets of experimental data. We believe that the criteria for negative ion accelerator design optimization should be: (i) to provide the best optics; (ii) to reduce the power load on the extraction grid; (iii) to allow operation with low electric fields in order to reduce the problem of breakdowns. We show some results of optics calculations performed for two systems that will be operational in the next months: the CEA-JAERI collaboration at Cadarache and the european DRAGON experiment at Culham. Extrapolations to higher energies of 500 to 1100 keV have also been conducted. All results indicate that the overall accelerator length, whatever be the number of gaps, is constrained by space charge effects (Child-Langmuir). We have combined this constraint with high-voltage hold-off empirical laws. As a result, it appears that accelerating 10 mA/cm 2 of D - at 1 MeV with good optics, as required for NET or ITER, is close to the expected limit of high-voltage hold-off

  10. Hybrid Microfluidic Platform for Multifactorial Analysis Based on Electrical Impedance, Refractometry, Optical Absorption and Fluorescence

    Directory of Open Access Journals (Sweden)

    Fábio M. Pereira

    2016-10-01

    Full Text Available This paper describes the development of a novel microfluidic platform for multifactorial analysis integrating four label-free detection methods: electrical impedance, refractometry, optical absorption and fluorescence. We present the rationale for the design and the details of the microfabrication of this multifactorial hybrid microfluidic chip. The structure of the platform consists of a three-dimensionally patterned polydimethylsiloxane top part attached to a bottom SU-8 epoxy-based negative photoresist part, where microelectrodes and optical fibers are incorporated to enable impedance and optical analysis. As a proof of concept, the chip functions have been tested and explored, enabling a diversity of applications: (i impedance-based identification of the size of micro beads, as well as counting and distinguishing of erythrocytes by their volume or membrane properties; (ii simultaneous determination of the refractive index and optical absorption properties of solutions; and (iii fluorescence-based bead counting.

  11. Pyrolytic 3D Carbon Microelectrodes for Electrochemistry

    DEFF Research Database (Denmark)

    Hemanth, Suhith; Caviglia, Claudia; Amato, Letizia

    2016-01-01

    electrochemical activity, chemical stability, and ease in surface functionalization [1]. The most common carbon microfabrication techniques (i.e. screen printing) produce two-dimensional (2D) electrodes, which limit the detection sensitivity. Hence several 3D microfabrication techniques have been explored......This work presents the fabrication and characterization of multi-layered three-dimensional (3D) pyrolysed carbon microelectrodes for electrochemical applications. For this purpose, an optimized UV photolithography and pyrolysis process with the negative tone photoresist SU-8 has been developed...... carbon [2]. This process enables fabrication of 2D and 3D electrodes with possibility for tailoring ad-hoc designs and unique sensitivities for specific applications. Due to this, pyrolysed carbon is becoming increasingly attractive for numerous applications, such as novel sensors and scaffolds for cell...

  12. Laser Structuring of Thin Layers for Flexible Electronics by a Shock Wave-induced Delamination Process

    Science.gov (United States)

    Lorenz, Pierre; Ehrhardt, Martin; Zimmer, Klaus

    The defect-free laser-assisted structuring of thin films on flexible substrates is a challenge for laser methods. However, solving this problem exhibits an outstanding potential for a pioneering development of flexible electronics. Thereby, the laser-assisted delamination method has a great application potential. At the delamination process: the localized removal of the layer is induced by a shock wave which is produced by a laser ablation process on the rear side of the substrate. In this study, the thin-film patterning process is investigated for different polymer substrates dependent on the material and laser parameters using a KrF excimer laser. The resultant structures were studied by optical microscopy and white light interferometry (WLI). The delamination process was tested at different samples (indium tin oxide (ITO) on polyethylene terephthalate (PET), epoxy-based negative photoresist (SU8) on polyimide (PI) and indium tin oxide/copper indium gallium selenide/molybdenum (ITO/CIGS/Mo) on PI.

  13. Reduced Zeta potential through use of cationic adhesion promoter for improved resist process performance and minimizing material consumption

    Science.gov (United States)

    Hodgson, Lorna; Thompson, Andrew

    2012-03-01

    This paper presents the results of a non-HMDS (non-silane) adhesion promoter that was used to reduce the zeta potential for very thin (proprietary) polymer on silicon. By reducing the zeta potential, as measured by the minimum sample required to fully coat a wafer, the amount of polymer required to coat silicon substrates was significantly reduced in the manufacture of X-ray windows used for high transmission of low-energy X-rays. Moreover, this approach used aqueous based adhesion promoter described as a cationic surface active agent that has been shown to improve adhesion of photoresists (positive, negative, epoxy [SU8], e-beam and dry film). As well as reducing the amount of polymer required to coat substrates, this aqueous adhesion promoter is nonhazardous, and contains non-volatile solvents.

  14. Electrical properties of thin epoxy-based polymer layers filled with n-carbon black particles

    Science.gov (United States)

    Klanjšek Gunde, Marta; Hauptman, Nina; Maček, Marijan

    2008-02-01

    The change of resistivity of the epoxy-based nanocomposite was studied in dependence on concentration of dispersed nanoparticles. The SU8 negative-tone photoresist was applied for the polymer matrix and the conductive carbon black powder for the fillings. The largest decrease of resistivity was obtained at 2-3 wt% of fillings whereas at loadings higher that 8 wt% it does not decreases further appreciably. The resistivity of the prepared nanocomposites becomes smaller after the UV-exposure. The applied nanofillings change the viscosity of the material but the spin-coating application still remains reliable and was approved to work well for concentrations of at least up to 3 wt%. The addition of nanofillings up to 2 wt% does not destroy the resolution of photolithography as seen on the standard test pattern with line widths from 2 to 10 μm.

  15. Tailoring stress in pyrolytic carbon for fabrication of nanomechanical string resonators

    DEFF Research Database (Denmark)

    Quang, Long Nguyen; Larsen, Peter Emil; Boisen, Anja

    2018-01-01

    In order to achieve high resonance frequencies and quality factors of pyrolytic carbon MEMS string resonators the resonator material needs to have a large tensile stress. In this study, the influence of pyrolysis temperature, dwell time and ramping rate on the residual stress in thin pyrolytic...... carbon films is investigated with the bending plate method. The results show that the pyrolysis temperature is the most important parameter for tailoring the residual stress, with a transition from tensile stress at temperature below 800ºC to compressive stress at temperatures above 800ºC. Two kinds...... of photoresist: positive (AZ5214E) and negative (SU-8) and different pyrolysis conditions are used to fabricate pyrolytic carbon string resonators at variable pyrolysis conditions. The best performance is obtained for devices with a length of 400 µm fabricated at a pyrolysis temperature of 700ºC, ramping rate...

  16. Some Phenomena on Negative Inversion Constructions

    Science.gov (United States)

    Sung, Tae-Soo

    2013-01-01

    We examine the characteristics of NDI (negative degree inversion) and its relation with other inversion phenomena such as SVI (subject-verb inversion) and SAI (subject-auxiliary inversion). The negative element in the NDI construction may be" not," a negative adverbial, or a negative verb. In this respect, NDI has similar licensing…

  17. Coinductive Logic Programming with Negation

    Science.gov (United States)

    Min, Richard; Gupta, Gopal

    We introduce negation into coinductive logic programming (co-LP) via what we term Coinductive SLDNF (co-SLDNF) resolution. We present declarative and operational semantics of co-SLDNF resolution and present their equivalence under the restriction of rationality. Co-LP with co-SLDNF resolution provides a powerful, practical and efficient operational semantics for Fitting's Kripke-Kleene three-valued logic with restriction of rationality. Further, applications of co-SLDNF resolution are also discussed and illustrated where Co-SLDNF resolution allows one to develop elegant implementations of modal logics. Moreover it provides the capability of non-monotonic inference (e.g., predicate Answer Set Programming) that can be used to develop novel and effective first-order modal non-monotonic inference engines.

  18. Congenital nystagmus and negative electroretinography

    Directory of Open Access Journals (Sweden)

    Roussi M

    2011-04-01

    Full Text Available Mirella Roussi, Hélène Dalens, Jean Jacques Marcellier, Franck BacinDepartment of Ophthalmology, Clermont-Ferrand University, Clermont-Ferrand, FranceAbstract: Congenital nystagmus is a pathologic oculomotor state appearing at about three to four months of age. The precise diagnosis requires detailed clinical examination and electrophysiological findings. This case report presents two male patients with congenital nystagmus examined longitudinally from the age of six months until 17-18 years of age. Clinical and electrophysiological protocols were detailed. The first results showed electronegative electroretinography in the two cases and examination combined with electroretinographic findings helped us to make the diagnosis of Congenital Night Stationary Blindness (CSNB. This diagnosis was confirmed by genetic studies. CSNB is interesting to study because through electrophysiological findings, it enables a better understanding of the physiology of neural transmission in the outer part of the retina.Keywords: Congenital nystagmus, negative electroretinography, congenital night stationary blindness

  19. Entanglement negativity in the multiverse

    Energy Technology Data Exchange (ETDEWEB)

    Kanno, Sugumi [Department of Theoretical Physics and History of Science, University of the Basque Country UPV/EHU, 48080 Bilbao (Spain); Shock, Jonathan P. [Laboratory for Quantum Gravity and Strings and Astrophysics, Cosmology and Gravity Center, Department of Mathematics and Applied Mathematics, University of Cape Town, Private Bag, Rondebosch 7701 (South Africa); Soda, Jiro, E-mail: sugumi.kanno@ehu.es, E-mail: jonathan.shock@uct.ac.za, E-mail: jiro@phys.sci.kobe-u.ac.jp [Department of Physics, Kobe University, Kobe 657-8501 (Japan)

    2015-03-01

    We explore quantum entanglement between two causally disconnected regions in the multiverse. We first consider a free massive scalar field, and compute the entanglement negativity between two causally separated open charts in de Sitter space. The qualitative feature of it turns out to be in agreement with that of the entanglement entropy. We then introduce two observers who determine the entanglement between two causally disconnected de Sitter spaces. When one of the observers remains constrained to a region of the open chart in a de Sitter space, we find that the scale dependence enters into the entanglement. We show that a state which is initially maximally entangled becomes more entangled or less entangled on large scales depending on the mass of the scalar field and recovers the initial entanglement in the small scale limit. We argue that quantum entanglement may provide some evidence for the existence of the multiverse.

  20. Entanglement negativity in the multiverse

    International Nuclear Information System (INIS)

    Kanno, Sugumi; Shock, Jonathan P.; Soda, Jiro

    2015-01-01

    We explore quantum entanglement between two causally disconnected regions in the multiverse. We first consider a free massive scalar field, and compute the entanglement negativity between two causally separated open charts in de Sitter space. The qualitative feature of it turns out to be in agreement with that of the entanglement entropy. We then introduce two observers who determine the entanglement between two causally disconnected de Sitter spaces. When one of the observers remains constrained to a region of the open chart in a de Sitter space, we find that the scale dependence enters into the entanglement. We show that a state which is initially maximally entangled becomes more entangled or less entangled on large scales depending on the mass of the scalar field and recovers the initial entanglement in the small scale limit. We argue that quantum entanglement may provide some evidence for the existence of the multiverse

  1. Entanglement negativity in the multiverse

    Energy Technology Data Exchange (ETDEWEB)

    Kanno, Sugumi [Department of Theoretical Physics and History of Science, University of the Basque Country UPV/EHU, 48080 Bilbao (Spain); IKERBASQUE, Basque Foundation for Science, Maria Diaz de Haro 3, 48013, Bilbao (Spain); Laboratory for Quantum Gravity & Strings and Astrophysics, Cosmology & Gravity Center, Department of Mathematics & Applied Mathematics, University of Cape Town, Private Bag, Rondebosch 7701 (South Africa); Shock, Jonathan P. [Laboratory for Quantum Gravity & Strings and Astrophysics, Cosmology & Gravity Center, Department of Mathematics & Applied Mathematics, University of Cape Town, Private Bag, Rondebosch 7701 (South Africa); National Institute for Theoretical Physics, Private Bag X1, Matieland, 7602 (South Africa); Soda, Jiro [Department of Physics, Kobe University, Kobe 657-8501 (Japan)

    2015-03-10

    We explore quantum entanglement between two causally disconnected regions in the multiverse. We first consider a free massive scalar field, and compute the entanglement negativity between two causally separated open charts in de Sitter space. The qualitative feature of it turns out to be in agreement with that of the entanglement entropy. We then introduce two observers who determine the entanglement between two causally disconnected de Sitter spaces. When one of the observers remains constrained to a region of the open chart in a de Sitter space, we find that the scale dependence enters into the entanglement. We show that a state which is initially maximally entangled becomes more entangled or less entangled on large scales depending on the mass of the scalar field and recovers the initial entanglement in the small scale limit. We argue that quantum entanglement may provide some evidence for the existence of the multiverse.

  2. Negative meson capture in hydrogen

    International Nuclear Information System (INIS)

    Baird, T.J.

    1977-01-01

    The processes of deexcitation and capture of negative mesons and hadrons in atomic hydrogen are investigated. Only slow collisions in which the projectile-atom relative velocity is less than one atomic unit are considered, and the motion of the incident particle is treated classically. For each classical trajectory the probability of ionizing the hydrogen atom is determined, together with the energy spectrum of the emitted electron. Ionization probabilities are calculated using the time-dependent formulation of the perturbed stationary state method. Exact two-center electronic wave functions are used for both bound and continuum states. The total ionization cross section and electron energy spectrum have been calculated for negative muons, kaons and antiprotons at incident relative velocities between 0.04 and 1.0 atomic units. The electron energy spectrum has a sharp peak for electron kinetic energies on the order of 10 -3 Rydbergs. The ionization process thus favors the emission of very slow electrons. The cross section for ionization with capture of the incident particle was calculated for relative kinetic energies greater than 1.0 Rydberg. Since ionization was found to occur with the emission of electrons of nearly zero kinetic energy, the fraction of ionizing collisions which result in capture decreases very rapidly with projectile kinetic energy. The energy distributions of slowed down muons and hadrons were also computed. These distributions were used together with the capture cross section to determine the distribution of kinetic energies at which capture takes place. It was found that most captures occur for kinetic energies slightly less than 1.0 Rydbergs with relatively little capture at thermal energies. The captured particles therefore tend to go into very large and loosely found orbits with binding energies less than 0.1 Rydbergs

  3. Hyperbolic spaces are of strictly negative type

    DEFF Research Database (Denmark)

    Hjorth, Poul G.; Kokkendorff, Simon L.; Markvorsen, Steen

    2002-01-01

    We study finite metric spaces with elements picked from, and distances consistent with, ambient Riemannian manifolds. The concepts of negative type and strictly negative type are reviewed, and the conjecture that hyperbolic spaces are of strictly negative type is settled, in the affirmative....... The technique of the proof is subsequently applied to show that every compact manifold of negative type must have trivial fundamental group, and to obtain a necessary criterion for product manifolds to be of negative type....

  4. Negative numbers and antimatter particles

    International Nuclear Information System (INIS)

    Tsan, Ung Chan

    2012-01-01

    Dirac's equation states that an electron implies the existence of an antielectron with the same mass (more generally same arithmetic properties) and opposite charge (more generally opposite algebraic properties). Subsequent observation of antielectron validated this concept. This statement can be extended to all matter particles; observation of antiproton, antineutron, antideuton … is in complete agreement with this view. Recently antihypertriton was observed and 38 atoms of antihydrogen were trapped. This opens the path for use in precise testing of nature's fundamental symmetries. The symmetric properties of a matter particle and its mirror antimatter particle seem to be well established. Interactions operate on matter particles and antimatter particles as well. Conservation of matter parallels addition operating on positive and negative numbers. Without antimatter particles, interactions of the Standard Model (electromagnetism, strong interaction and weak interaction) cannot have the structure of group. Antimatter particles are characterized by negative baryonic number A or/and negative leptonic number L. Materialization and annihilation obey conservation of A and L (associated to all known interactions), explaining why from pure energy (A = 0, L = 0) one can only obtain a pair of matter particle antimatter particle — electron antielectron, proton and antiproton — via materialization where the mass of a pair of particle antiparticle gives back to pure energy with annihilation. These two mechanisms cannot change the difference in the number of matter particles and antimatter particles. Thus from pure energy only a perfectly symmetric (in number) universe could be generated as proposed by Dirac but observation showed that our universe is not symmetric, it is a matter universe which is nevertheless neutral. Fall of reflection symmetries shattered the prejudice that there is no way to define in an absolute way right and left or matter and antimatter

  5. Negative ion sources for tandem accelerator

    International Nuclear Information System (INIS)

    Minehara, Eisuke

    1980-08-01

    Four kinds of negative ion sources (direct extraction Duoplasmatron ion source, radial extraction Penniing ion source, lithium charge exchange ion source and Middleton-type sputter ion source) have been installed in the JAERI tandem accelerator. The ion sources can generate many negative ions ranging from Hydrogen to Uranium with the exception of Ne, Ar, Kr, Xe and Rn. Discussions presented in this report include mechanisms of negative ion formation, electron affinity and stability of negative ions, performance of the ion sources and materials used for negative ion production. Finally, the author will discuss difficult problems to be overcome in order to get any negative ion sufficiently. (author)

  6. Reversing a Negative Measurement in Process with Negative Events: A Haunted Negative Measurement and the Bifurcation of Time

    CERN Document Server

    Snyder, D M

    2003-01-01

    Reversing an ordinary measurement in process (a haunted measurement) is noted and the steps involved in reversing a negative measurement in process (a haunted negative measurement) are described. In order to discuss in a thorough manner reversing an ordinary measurement in process, one has to account for how reversing a negative measurement in process would work for the same experimental setup. The reason it is necessary to know how a negative measurement in process is reversed is because for a given experimental setup there is no physical distinction between reversing a negative measurement in process and reversing an ordinary measurement in process. In the absence of the reversal of a negative measurement in process in the same experimental setup that supports the reversal of an ordinary measurement in process, the possibility exists of which-way information concerning the negative measurement that would render theoretically implausible reversing an ordinary measuremnt in process. The steps in reversing a n...

  7. Negative creep in nickel base superalloys

    DEFF Research Database (Denmark)

    Dahl, Kristian Vinter; Hald, John

    2004-01-01

    Negative creep describes the time dependent contraction of a material as opposed to the elongation seen for a material experiencing normal creep behavior. Negative creep occurs because of solid state transformations that results in lattice contractions. For most applications negative creep will h...

  8. Negative concord and the scope of universals

    NARCIS (Netherlands)

    Giannakidou, A

    2000-01-01

    In this paper, I propose an analysis of Greek negative concord (NC) in terms of quantifier scope. It is shown that there is no evidence that Greek NC n-words are indefinites or negative quantifiers, NC n-words are analysed as universal quantifiers, which are sensitive to negative polarity, and which

  9. Negative Ions in low pressure discharges

    NARCIS (Netherlands)

    Stoffels - Adamowicz, E.; Stoffels, W.W.; Vender, D.; Haverlag, M.; Kroesen, G.M.W.; Hoog, de F.J.

    1995-01-01

    Several aspects of negative ions in low pressure discharges are treated. The elementary processes, in which negative ions are produced and destroyed, are summarized. The influence of negative ions on plasma operation is analyzed in terms of transport equations. It is shown that diffusion, electric

  10. Low-noise polymeric nanomechanical biosensors

    DEFF Research Database (Denmark)

    Calleja, M.; Tamayo, J.; Nordström, Maria

    2006-01-01

    A sensor device based on a single polymer cantilever and optical readout has been developed for detection of molecular recognition reactions without the need of a reference cantilever for subtraction of unspecific signals. Microcantilevers have been fabricated in the photoresist SU-8 with one sur...

  11. Design, Fabrication and Testing of Tunable RF Meta-atoms

    Science.gov (United States)

    2012-06-14

    representative adhesive layers include photoresist, polymer adhesive and spin-on glass adhesive [44] 33 2.2.1.2. Micromolding Micromolding is commonly...lithography system is set up to use a 488 nm wavelength diode laser. It has the capability to generate 1 cm 2 fishnet patterns using SU8 -2025 blended with

  12. Surface Functionalization of Epoxy-Resist- Based Microcantilevers with Iron Oxide Nanocrystals

    DEFF Research Database (Denmark)

    Ingrosso, Chiara; Sardella, E.; Keller, Stephan Sylvest

    2010-01-01

    A functionalization procedure is integrated in the fabrication of micromechanical SU-8 cantilevers in order to chemically bind organic-capped Fe2O3 NCs at the photoresist surface, under visible light, ambient atmosp here and room temperature. The achieved highly interconnected NC multilayer netwo...... is demonstrated an active layer for real-time detection of acetone vapor molecules....

  13. Improved Adhesion of Gold Thin Films Evaporated on Polymer Resin: Applications for Sensing Surfaces and MEMS

    Directory of Open Access Journals (Sweden)

    Behrang Moazzez

    2013-05-01

    Full Text Available We present and analyze a method to improve the morphology and mechanical properties of gold thin films for use in optical sensors or other settings where good adhesion of gold to a substrate is of importance and where controlled topography/roughness is key. To improve the adhesion of thermally evaporated gold thin films, we introduce a gold deposition step on SU-8 photoresist prior to UV exposure but after the pre-bake step of SU-8 processing. Shrinkage and distribution of residual stresses, which occur during cross-linking of the SU-8 polymer layer in the post-exposure baking step, are responsible for the higher adhesion of the top gold film to the post-deposition cured SU-8 sublayer. The SU-8 underlayer can also be used to tune the resulting gold film morphology. Our promoter-free protocol is easily integrated with existing sensor microfabrication processes.

  14. Impact of negation salience and cognitive resources on negation during attitude formation.

    Science.gov (United States)

    Boucher, Kathryn L; Rydell, Robert J

    2012-10-01

    Because of the increased cognitive resources required to process negations, past research has shown that explicit attitude measures are more sensitive to negations than implicit attitude measures. The current work demonstrated that the differential impact of negations on implicit and explicit attitude measures was moderated by (a) the extent to which the negation was made salient and (b) the amount of cognitive resources available during attitude formation. When negations were less visually salient, explicit but not implicit attitude measures reflected the intended valence of the negations. When negations were more visually salient, both explicit and implicit attitude measures reflected the intended valence of the negations, but only when perceivers had ample cognitive resources during encoding. Competing models of negation processing, schema-plus-tag and fusion, were examined to determine how negation salience impacts the processing of negations.

  15. Electrochemical cell and negative electrode therefor

    Science.gov (United States)

    Kaun, Thomas D.

    1982-01-01

    A secondary electrochemical cell with the positive and negative electrodes separated by a molten salt electrolyte with the negative electrode comprising a particulate mixture of lithium-aluminum alloy and electrolyte and an additive selected from graphitized carbon, Raney iron or mixtures thereof. The lithium-aluminum alloy is present in the range of from about 45 to about 80 percent by volume of the negative electrode, and the electrolyte is present in an amount not less than about 10 percent by volume of the negative electrode. The additive of graphitized carbon is present in the range of from about 1 to about 10 percent by volume of the negative electrode, and the Raney iron additive is present in the range of from about 3 to about 10 percent by volume of the negative electrode.

  16. On multiphase negative flash for ideal solutions

    DEFF Research Database (Denmark)

    Yan, Wei; Stenby, Erling Halfdan

    2012-01-01

    simpler than the corresponding normal flash algorithm. Unlike normal flash, multiphase negative flash for ideal solutions can diverge if the feasible domain for phase amounts is not closed. This can be judged readily during the iteration process. The algorithm can also be extended to the partial negative......There is a recent interest to solve multiphase negative flash problems where the phase amounts can be negative for normal positive feed composition. Solving such a negative flash problem using successive substitution needs an inner loop for phase distribution calculation at constant fugacity...... coefficients. It is shown that this inner loop, named here as multiphase negative flash for ideal solutions, can be solved either by Michelsen's algorithm for multiphase normal flash, or by its variation which uses F−1 phase amounts as independent variables. In either case, the resulting algorithm is actually...

  17. Zero-truncated negative binomial - Erlang distribution

    Science.gov (United States)

    Bodhisuwan, Winai; Pudprommarat, Chookait; Bodhisuwan, Rujira; Saothayanun, Luckhana

    2017-11-01

    The zero-truncated negative binomial-Erlang distribution is introduced. It is developed from negative binomial-Erlang distribution. In this work, the probability mass function is derived and some properties are included. The parameters of the zero-truncated negative binomial-Erlang distribution are estimated by using the maximum likelihood estimation. Finally, the proposed distribution is applied to real data, the number of methamphetamine in the Bangkok, Thailand. Based on the results, it shows that the zero-truncated negative binomial-Erlang distribution provided a better fit than the zero-truncated Poisson, zero-truncated negative binomial, zero-truncated generalized negative-binomial and zero-truncated Poisson-Lindley distributions for this data.

  18. Negative Pressure Wound Therapy in Maxillofacial Applications

    Directory of Open Access Journals (Sweden)

    Adam J. Mellott

    2016-09-01

    Full Text Available Negative pressure wound therapy has greatly advanced the field of wound healing for nearly two decades, by providing a robust surgical adjunct technique for accelerating wound closure in acute and chronic wounds. However, the application of negative pressure wound therapy in maxillofacial applications has been relatively under utilized as a result of the physical articulations and contours of the head and neck that make it challenging to obtain an airtight seal for different negative pressure wound therapy systems. Adapting negative pressure wound therapies for maxillofacial applications could yield significant enhancement of wound closure in maxillofacial applications. The current review summarizes the basic science underlying negative pressure wound therapy, as well as specific maxillofacial procedures that could benefit from negative pressure wound therapy.

  19. Stop Negative Thinking Effects for Drug Dependence

    OpenAIRE

    Windiarti, Sri Endang; Indriati, Indriati; Surachmi, Fajar

    2013-01-01

    The purpose of this study was to determine the effect of therapy stop thinking negatively against drug addiction in Rehabilitation Orphanage Rumah Damai Gunung Pati Semarang. This research is quasy experiment with pretest - posttes without the control group design. Thirty respondents were taken to the reseach sujects. Stop thinking negative therapy before and after thebehavior of drug addiction there are differences (t = 0.00), so it can be stated that the therapy stop thinking negatively inf...

  20. Art, Terrorism and the Negative Sublime

    Directory of Open Access Journals (Sweden)

    Arnold Berleant

    2009-01-01

    Full Text Available The range of the aesthetic has expanded to cover not only a wider range of objects and situations of daily life but also to encompass the negative. This includes terrorism, whose aesthetic impact is central to its use as a political tactic. The complex of positive and negative aesthetic values in terrorism are explored, introducing the concept of the sublime as a negative category to illuminate the analysis and the distinctive aesthetic of terrorism.

  1. Analyzing negative ties in social networks

    Directory of Open Access Journals (Sweden)

    Mankirat Kaur

    2016-03-01

    Full Text Available Online social networks are a source of sharing information and maintaining personal contacts with other people through social interactions and thus forming virtual communities online. Social networks are crowded with positive and negative relations. Positive relations are formed by support, endorsement and friendship and thus, create a network of well-connected users whereas negative relations are a result of opposition, distrust and avoidance creating disconnected networks. Due to increase in illegal activities such as masquerading, conspiring and creating fake profiles on online social networks, exploring and analyzing these negative activities becomes the need of hour. Usually negative ties are treated in same way as positive ties in many theories such as balance theory and blockmodeling analysis. But the standard concepts of social network analysis do not yield same results in respect of each tie. This paper presents a survey on analyzing negative ties in social networks through various types of network analysis techniques that are used for examining ties such as status, centrality and power measures. Due to the difference in characteristics of flow in positive and negative tie networks some of these measures are not applicable on negative ties. This paper also discusses new methods that have been developed specifically for analyzing negative ties such as negative degree, and h∗ measure along with the measures based on mixture of positive and negative ties. The different types of social network analysis approaches have been reviewed and compared to determine the best approach that can appropriately identify the negative ties in online networks. It has been analyzed that only few measures such as Degree and PN centrality are applicable for identifying outsiders in network. For applicability in online networks, the performance of PN measure needs to be verified and further, new measures should be developed based upon negative clique concept.

  2. Detection of negative energy: 4-dimensional examples

    International Nuclear Information System (INIS)

    Davies, P.C.W.; Ottewill, Adrian C.

    2002-01-01

    We study the response of switched particle detectors to static negative energy densities and negative energy fluxes. It is demonstrated how the switching leads to excitation even in the vacuum and how negative energy can lead to a suppression of this excitation. We obtain quantum inequalities on the detection similar to those obtained for the energy density by Ford and co-workers and in an 'operational' context by Helfer. We reexamine the question 'Is there a quantum equivalence principle?' in terms of our model. Finally, we briefly address the issue of negative energy and the second law of thermodynamics

  3. Ink-jet printing technology enables self-aligned mould patterning for electroplating in a single step

    International Nuclear Information System (INIS)

    Meissner, M V; Spengler, N; Mager, D; Wang, N; Kiss, S Z; Höfflin, J; While, P T; Korvink, J G

    2015-01-01

    We present a new self-aligned, mask-free micro-fabrication method with which to form thick-layered conductive metal micro-structures inside electroplating moulds. Seed layer patterning for electroplating was performed by ink-jet printing using a silver nano-particle ink deposited on SU-8 or Ordyl SY permanent resist. The silver ink contact angle on SU-8 was adjusted by oxygen plasma followed by a hard bake. Besides functioning as a seed layer, the printed structures further served as a shadow mask during patterning of electroplating moulds into negative photoresist. The printed silver tracks remained in strong adhesion to the substrate when exposed to the acidic chemistry of the electroplating bath. To demonstrate the process, we manufactured rectangular, low-resistivity planar micro-coils for use in magnetic resonance microscopy. MRI images of a spring onion with an in-plane resolution down to 10 µm × 10 µm were acquired using a micro-coil on an 11.7 T MRI scanner. (paper)

  4. Physics of negative refractive index materials

    International Nuclear Information System (INIS)

    Ramakrishna, S Anantha

    2005-01-01

    In the past few years, new developments in structured electromagnetic materials have given rise to negative refractive index materials which have both negative dielectric permittivity and negative magnetic permeability in some frequency ranges. The idea of a negative refractive index opens up new conceptual frontiers in photonics. One much-debated example is the concept of a perfect lens that enables imaging with sub-wavelength image resolution. Here we review the fundamental concepts and ideas of negative refractive index materials. First we present the ideas of structured materials or meta-materials that enable the design of new materials with a negative dielectric permittivity, negative magnetic permeability and negative refractive index. We discuss how a variety of resonance phenomena can be utilized to obtain these materials in various frequency ranges over the electromagnetic spectrum. The choice of the wave-vector in negative refractive index materials and the issues of dispersion, causality and energy transport are analysed. Various issues of wave propagation including nonlinear effects and surface modes in negative refractive materials (NRMs) are discussed. In the latter part of the review, we discuss the concept of a perfect lens consisting of a slab of a NRM. This perfect lens can image the far-field radiative components as well as the near-field evanescent components, and is not subject to the traditional diffraction limit. Different aspects of this lens such as the surface modes acting as the mechanism for the imaging of the evanescent waves, the limitations imposed by dissipation and dispersion in the negative refractive media, the generalization of this lens to optically complementary media and the possibility of magnification of the near-field images are discussed. Recent experimental developments verifying these ideas are briefly covered

  5. Cesium injection system for negative ion duoplasmatrons

    International Nuclear Information System (INIS)

    Kobayashi, M.; Prelec, K.; Sluyters, T.J.

    1978-01-01

    A design for admitting cesium vapor into a hollow hydrogen plasma discharge in a duoplasmatron ion source for the purpose of increasing the negative hydrogen ion output current is described. 60 mA beam currents for negative hydrogen ions are reported

  6. Finite Metric Spaces of Strictly Negative Type

    DEFF Research Database (Denmark)

    Hjorth, Poul; Lisonek, P.; Markvorsen, Steen

    1998-01-01

    of Euclidean spaces. We prove that, if the distance matrix is both hypermetric and regular, then it is of strictly negative type. We show that the strictly negative type finite subspaces of spheres are precisely those which do not contain two pairs of antipodal points. In connection with an open problem raised...

  7. Negating the Infinitive in Biblical Hebrew

    DEFF Research Database (Denmark)

    Ehrensvärd, Martin Gustaf

    1999-01-01

    The article examines the negating of the infinitive in biblical and post-biblical Hebrew. The combination of the negation ayin with infinitive is widely claimed to belong to the linguistic layer commonly referred to as late biblical Hebrew and scholars use it to late-date texts. The article showa...

  8. Stochastic background of negative binomial distribution

    International Nuclear Information System (INIS)

    Suzuki, N.; Biyajima, M.; Wilk, G.

    1991-01-01

    A branching equations of the birth process with immigration is taken as a model for the particle production process. Using it we investigate cases in which its solution becomes the negative binomial distribution. Furthermore, we compare our approach with the modified negative binomial distribution proposed recently by Chliapnikov and Tchikilev and use it to analyse the observed multiplicity distributions. (orig.)

  9. Atomic capture of negative mesons in hydrogen

    International Nuclear Information System (INIS)

    Leon, M.

    1979-01-01

    After a brief description of the present state of theoretical understanding of atomic capture of negative mesons, a very simple model calculation of negative muon capture by the simplest atoms, hydrogen is described. Also the possibility of generalizing these results to more complicated atoms and even molecules is noted. 15 references

  10. Bootstrapping Visual Categorization with Relevant Negatives

    NARCIS (Netherlands)

    Li, X.; Snoek, C.G.M.; Worring, M.; Koelma, D.; Smeulders, A.W.M.

    Learning classifiers for many visual concepts are important for image categorization and retrieval. As a classifier tends to misclassify negative examples which are visually similar to positive ones, inclusion of such misclassified and thus relevant negatives should be stressed during learning.

  11. Social negative bootstrapping for visual categorization

    NARCIS (Netherlands)

    Li, X.; Snoek, C.G.M.; Worring, M.; Smeulders, A.W.M.

    2011-01-01

    To learn classifiers for many visual categories, obtaining labeled training examples in an efficient way is crucial. Since a classifier tends to misclassify negative examples which are visually similar to positive examples, inclusion of such informative negatives should be stressed in the learning

  12. Scope of negation detection in sentiment analysis

    NARCIS (Netherlands)

    Dadvar, M.; Hauff, C.; de Jong, Franciska M.G.

    2011-01-01

    An important part of information-gathering behaviour has always been to find out what other people think and whether they have favourable (positive) or unfavourable (negative) opinions about the subject. This survey studies the role of negation in an opinion-oriented information-seeking system. We

  13. Negative Priming in Free Recall Reconsidered

    Science.gov (United States)

    Hanczakowski, Maciej; Beaman, C. Philip; Jones, Dylan M.

    2016-01-01

    Negative priming in free recall is the finding of impaired memory performance when previously ignored auditory distracters become targets of encoding and retrieval. This negative priming has been attributed to an aftereffect of deploying inhibitory mechanisms that serve to suppress auditory distraction and minimize interference with learning and…

  14. Distress attributed to negative symptoms in schizophrenia

    NARCIS (Netherlands)

    Selten, JP; Wiersma, D; van den Bosch, RJ

    2000-01-01

    The purpose of the study was to examine (1) to which negative symptoms schizophrenia patients attribute distress and (2) whether clinical variables can predict the levels of reported distress. With the help of a research assistant, 86 hospitalized patients completed a self-rating scale for negative

  15. Brilliant but Cruel: Perceptions of Negative Evaluators.

    Science.gov (United States)

    Amabile, Teresa M.

    Two studies examined the hypothesis that negative evaluators will be perceived as more intelligent than positive evalutors. Two types of stimuli were used: excerpts from actual negative and positive book reviews, and versions of those excerpts that were edited so that the balance of the reviews varied but the content did not. The results strongly…

  16. Appendicitis: A Study of Negative Appendicectomies | Kpolugbo ...

    African Journals Online (AJOL)

    Post-operative complications were noted in 3% of the negative appendicectomy group but in the positive appendicectomy group complications were much more common particularly when the appendix was ruptured. (Key Words: Negative appendicectomy, perforated appendix and postoperative complications.) Sahel Med.

  17. Negative incidental emotions augment fairness sensitivity.

    Science.gov (United States)

    Liu, Cuizhen; Chai, Jing Wen; Yu, Rongjun

    2016-04-22

    Previous studies have shown that task-unrelated emotions induced incidentally exert carryover effects on individuals' subsequent decisions in financial negotiations. However, the specificity of these emotion effects are not clear. In three experiments, we systematically investigated the role of seven transiently induced basic emotions (disgust, sadness, anger, fear, happiness, surprise and neutral) on rejection of unfair offers using the ultimatum game. We found that all negative emotions (disgust, sadness, anger and fear), but not happiness or surprise, significantly increased rejection rates, suggesting that the effect of incidental negative emotions on fairness is not specific to the type of negative emotion. Our findings highlight the role of fleeting emotions in biasing decision-making processes and suggest that all incidental negative emotions exert similar effects on fairness sensitivity, possibly by potentiating attention towards negative aspects of the situation.

  18. Suggestibility and negative priming: two replication studies.

    Science.gov (United States)

    David, Daniel; Brown, Richard J

    2002-07-01

    Research suggests that inhibiting the effect of irrelevant stimuli on subsequent thought and action (cognitive inhibition) may be an important component of suggestibility. Two small correlation studies were conducted to address the relationship between different aspects of suggestibility and individual differences in cognitive inhibition, operationalized as the degree of negative priming generated by to-be-ignored stimuli in a semantic categorization task. The first study found significant positive correlations between negative priming, hypnotic suggestibility, and creative imagination; a significant negative correlation was obtained between negative priming and interrogative suggestibility, demonstrating the discriminant validity of the study results. The second study replicated the correlation between negative priming and hypnotic suggestibility, using a different suggestibility measurement procedure that assessed subjective experience and hypnotic involuntariness as well as objective responses to suggestions. These studies support the notion that the ability to engage in cognitive inhibition may be an important component of hypnotic responsivity and maybe of other forms of suggestibility.

  19. Surface negative ion production in ion sources

    International Nuclear Information System (INIS)

    Belchenko, Y.

    1993-01-01

    Negative ion sources and the mechanisms for negative ion production are reviewed. Several classes of sources with surface origin of negative ions are examined in detail: surface-plasma sources where ion production occurs on the electrode in contact with the plasma, and ''pure surface'' sources where ion production occurs due to conversion or desorption processes. Negative ion production by backscattering, impact desorption, and electron- and photo-stimulated desorption are discussed. The experimental efficiencies of intense surface negative ion production realized on electrodes contacted with hydrogen-cesium or pure hydrogen gas-discharge plasma are compared. Recent modifications of surface-plasma sources developed for accelerator and fusion applications are reviewed in detail

  20. Negative permeability from random particle composites

    Energy Technology Data Exchange (ETDEWEB)

    Hussain, Shahid, E-mail: shussain2@qinetiq.com

    2017-04-15

    Artificial media, such as those composed of periodically-spaced wires for negative permittivity and split ring resonators for negative permeability have been extensively investigated for negative refractive index (NRI) applications (Smith et al., 2004; Pendry et al., 1999) [1,2]. This paper presents an alternative method for producing negative permeability: granular (or particulate) composites incorporating magnetic fillers. Artificial media, such as split-ring resonators, are designed to produce a magnetic resonance feature, which results in negative permeability over a narrow frequency range about the resonance frequency. The position of the feature is dependent upon the size of the inclusion. The material in this case is anisotropic, such that the feature is only observable when the materials are orientated in a specific direction relative to the applied field. A similar resonance can be generated in magnetic granular (particulate) materials: ferromagnetic resonance from the natural spin resonance of particles. Although the theoretical resonance profiles in granular composites shows the permeability dipping to negative values, this is rarely observed experimentally due to resonance damping effects. Results are presented for iron in spherical form and in flake form, dispersed in insulating host matrices. The two particle shapes show different permeability performance, with the magnetic flakes producing a negative contribution. This is attributed to the stronger coupling with the magnetic field resulting from the high aspect ratio of the flakes. The accompanying ferromagnetic resonance is strong enough to overcome the effects of damping and produce negative permeability. The size of random particle composites is not dictated by the wavelength of the applied field, so the materials are potentially much thinner than other, more traditional artificial composites at microwave frequencies. - Highlights: • Negative permeability from random particle composites is

  1. Negated bio-events: analysis and identification

    Science.gov (United States)

    2013-01-01

    Background Negation occurs frequently in scientific literature, especially in biomedical literature. It has previously been reported that around 13% of sentences found in biomedical research articles contain negation. Historically, the main motivation for identifying negated events has been to ensure their exclusion from lists of extracted interactions. However, recently, there has been a growing interest in negative results, which has resulted in negation detection being identified as a key challenge in biomedical relation extraction. In this article, we focus on the problem of identifying negated bio-events, given gold standard event annotations. Results We have conducted a detailed analysis of three open access bio-event corpora containing negation information (i.e., GENIA Event, BioInfer and BioNLP’09 ST), and have identified the main types of negated bio-events. We have analysed the key aspects of a machine learning solution to the problem of detecting negated events, including selection of negation cues, feature engineering and the choice of learning algorithm. Combining the best solutions for each aspect of the problem, we propose a novel framework for the identification of negated bio-events. We have evaluated our system on each of the three open access corpora mentioned above. The performance of the system significantly surpasses the best results previously reported on the BioNLP’09 ST corpus, and achieves even better results on the GENIA Event and BioInfer corpora, both of which contain more varied and complex events. Conclusions Recently, in the field of biomedical text mining, the development and enhancement of event-based systems has received significant interest. The ability to identify negated events is a key performance element for these systems. We have conducted the first detailed study on the analysis and identification of negated bio-events. Our proposed framework can be integrated with state-of-the-art event extraction systems. The

  2. Ice nucleation triggered by negative pressure.

    Science.gov (United States)

    Marcolli, Claudia

    2017-11-30

    Homogeneous ice nucleation needs supercooling of more than 35 K to become effective. When pressure is applied to water, the melting and the freezing points both decrease. Conversely, melting and freezing temperatures increase under negative pressure, i.e. when water is stretched. This study presents an extrapolation of homogeneous ice nucleation temperatures from positive to negative pressures as a basis for further exploration of ice nucleation under negative pressure. It predicts that increasing negative pressure at temperatures below about 262 K eventually results in homogeneous ice nucleation while at warmer temperature homogeneous cavitation, i. e. bubble nucleation, dominates. Negative pressure occurs locally and briefly when water is stretched due to mechanical shock, sonic waves, or fragmentation. The occurrence of such transient negative pressure should suffice to trigger homogeneous ice nucleation at large supercooling in the absence of ice-nucleating surfaces. In addition, negative pressure can act together with ice-inducing surfaces to enhance their intrinsic ice nucleation efficiency. Dynamic ice nucleation can be used to improve properties and uniformity of frozen products by applying ultrasonic fields and might also be relevant for the freezing of large drops in rainclouds.

  3. Information Filtering Based on Users' Negative Opinions

    Science.gov (United States)

    Guo, Qiang; Li, Yang; Liu, Jian-Guo

    2013-05-01

    The process of heat conduction (HC) has recently found application in the information filtering [Zhang et al., Phys. Rev. Lett.99, 154301 (2007)], which is of high diversity but low accuracy. The classical HC model predicts users' potential interested objects based on their interesting objects regardless to the negative opinions. In terms of the users' rating scores, we present an improved user-based HC (UHC) information model by taking into account users' positive and negative opinions. Firstly, the objects rated by users are divided into positive and negative categories, then the predicted interesting and dislike object lists are generated by the UHC model. Finally, the recommendation lists are constructed by filtering out the dislike objects from the interesting lists. By implementing the new model based on nine similarity measures, the experimental results for MovieLens and Netflix datasets show that the new model considering negative opinions could greatly enhance the accuracy, measured by the average ranking score, from 0.049 to 0.036 for Netflix and from 0.1025 to 0.0570 for Movielens dataset, reduced by 26.53% and 44.39%, respectively. Since users prefer to give positive ratings rather than negative ones, the negative opinions contain much more information than the positive ones, the negative opinions, therefore, are very important for understanding users' online collective behaviors and improving the performance of HC model.

  4. Distinguishing Entailment and Presupposition Under Negation Test

    Directory of Open Access Journals (Sweden)

    Gatri Asti Putri Indarti

    2016-12-01

    Full Text Available Distinguishing entailment from presupposition is quite difficult because their semantic relation seems to be similar. Both entailment and presupposition have an automatic relationship based on the context. However, those semantic relations can still be differentiated by using negation test to show whether a pair is entailment or presupposition. This research focuses on sentences and utterances. Thus, this research aims to analyze and test pairs of entailment and pairs of presupposition by using negation in utterances. The data were twelve comic strips from the Internet and they were analysed by using a negation test. The analysis shows that negation test is useful to test entailment and presupposition in the comic strips. It can be concluded that the difficulty of distinguishing pair of entailment and presupposition in the comic strip using negation test has been successfully solved. In this case, negation test is suitable to test entailment and presupposition. This research can be developed further by other researchers to distinguish entailment and presupposition by using another test if the negation test cannot be used to any further extent.   DOI: https://doi.org/10.24071/llt.2015.180104

  5. Lateralization of cortical negative motor areas.

    Science.gov (United States)

    Borggraefe, Ingo; Catarino, Claudia B; Rémi, Jan; Vollmar, Christian; Peraud, Aurelia; Winkler, Peter A; Noachtar, Soheyl

    2016-10-01

    The lateral and mesial aspects of the central and frontal cortex were studied by direct electrical stimulation of the cortex in epilepsy surgery candidates in order to determine the localization of unilateral and bilateral negative motor responses. Results of electrical cortical stimulation were examined in epilepsy surgery candidates in whom invasive electrodes were implanted. The exact localization of subdural electrodes was defined by fusion of 3-dimensional reconstructed MRI and CT images in 13 patients and by analysis of plane skull X-rays and intraoperative visual localization of the electrodes in another 7 patients. Results of electrical stimulation of the cortex were evaluated in a total of 128 patients in whom invasive electrodes were implanted for planning resective epilepsy surgery. Twenty patients, in whom negative motor responses were obtained, were included in the study. Bilateral upper limb negative motor responses were more often elicited from stimulation of the mesial frontal cortex whereas stimulation of the lateral central cortex leads to contralateral upper limb negative motor responses (pfrontal gyrus whereas contralateral negative motor responses localized predominantly in the anterior part of the precentral gyrus (pgyrus and the mesial fronto-central cortex showing functional differences with regard to unilateral and bilateral upper limb representation. The lateral fronto-central negative motor area serves predominantly contralateral upper limb motor control whereas the mesial frontal negative motor area represents bilateral upper limb movement control. Copyright © 2016 International Federation of Clinical Neurophysiology. Published by Elsevier Ireland Ltd. All rights reserved.

  6. Negative HPV screening test predicts low cervical cancer risk better than negative Pap test

    Science.gov (United States)

    Based on a study that included more than 1 million women, investigators at NCI have determined that a negative test for HPV infection compared to a negative Pap test provides greater safety, or assurance, against future risk of cervical cancer.

  7. Does Negative Type Characterize the Round Sphere?

    DEFF Research Database (Denmark)

    Kokkendorff, Simon Lyngby

    2007-01-01

    We discuss the measure theoretic metric invariants extent, mean distance and symmetry ratio and their relation to the concept of negative type of a metric space. A conjecture stating that a compact Riemannian manifold with symmetry ratio 1 must be a round sphere, was put forward in a previous paper....... We resolve this conjecture in the class of Riemannian symmetric spaces by showing, that a Riemannian manifold with symmetry ratio 1 must be of negative type and that the only compact Riemannian symmetric spaces of negative type are the round spheres....

  8. How does negative emotion cause false memories?

    Science.gov (United States)

    Brainerd, C J; Stein, L M; Silveira, R A; Rohenkohl, G; Reyna, V F

    2008-09-01

    Remembering negative events can stimulate high levels of false memory, relative to remembering neutral events. In experiments in which the emotional valence of encoded materials was manipulated with their arousal levels controlled, valence produced a continuum of memory falsification. Falsification was highest for negative materials, intermediate for neutral materials, and lowest for positive materials. Conjoint-recognition analysis produced a simple process-level explanation: As one progresses from positive to neutral to negative valence, false memory increases because (a) the perceived meaning resemblance between false and true items increases and (b) subjects are less able to use verbatim memories of true items to suppress errors.

  9. Double Negative Materials (DNM), Phenomena and Applications

    Science.gov (United States)

    2009-07-01

    5697–5711. Maksimović, M., and Z. Jakšić. “Emittance and Absorptance Tailoring by Negative Refractive Index Metamaterial-Based Cantor Multilayers.” J...TOKEN=48950826 Popov, A. K., S. A. Myslivets, T. F. George , and V. M. Shalaev. “Tailoring Transparency of Negative-Index Metamaterials With Parametric...Popov, A. K., S. A. Myslivets, T. F. George , and V. M. Shalaev. “Compensating Losses in Positive- and Negative-Index Metamaterials Through

  10. The brief negative symptom scale: psychometric properties.

    Science.gov (United States)

    Kirkpatrick, Brian; Strauss, Gregory P; Nguyen, Linh; Fischer, Bernard A; Daniel, David G; Cienfuegos, Angel; Marder, Stephen R

    2011-03-01

    The participants in the NIMH-MATRICS Consensus Development Conference on Negative Symptoms recommended that an instrument be developed that measured blunted affect, alogia, asociality, anhedonia, and avolition. The Brief Negative Symptom Scale (BNSS) is a 13-item instrument designed for clinical trials and other studies that measures these 5 domains. The interrater, test-retest, and internal consistency of the instrument were strong, with respective intraclass correlation coefficients of 0.93 for the BNSS total score and values of 0.89-0.95 for individual subscales. Comparisons with positive symptoms and other negative symptom instruments supported the discriminant and concurrent validity of the instrument.

  11. Negative dimensions in quantum field theory

    International Nuclear Information System (INIS)

    Ricotta, R.M.

    1989-01-01

    The basic fundaments of the negative dimensional integration method are reviewed. Its properties and the calculations of few Feynman amplitudes are presented as well as other new applications of the method. (author)

  12. Exploring the Psychological Influence of Perceived Negative ...

    African Journals Online (AJOL)

    Nneka Umera-Okeke

    2017-10-14

    Oct 14, 2017 ... This paper critically examined the psychological influence of ... development, there are some perceived negative foreign factors that have constituted ..... essence, it is the sum total of the individual's cognitive, intellectual and ...

  13. Nonlinear waves in plasma with negative ion

    International Nuclear Information System (INIS)

    Saito, Maki; Watanabe, Shinsuke; Tanaca, Hiroshi.

    1984-01-01

    The propagation of nonlinear ion wave is investigated theoretically in a plasma with electron, positive ion and negative ion. The ion wave of long wavelength is described by a modified K-dV equation instead of a K-dV equation when the nonlinear coefficient of the K-dV equation vanishes at the critical density of negative ion. In the vicinity of the critical density, the ion wave is described by a coupled K-dV and modified K-dV equation. The transition from a compressional soliton to a rarefactive soliton and vice versa are examined by the coupled equation as a function of the negative ion density. The ion wave of short wavelength is described by a nonlinear Schroedinger equation. In the plasma with a negative ion, the nonlinear coefficient of the nonlinear Schroedinger equation changes the sign and the ion wave becomes modulationally unstable. (author)

  14. The strategic significance of negative externalities.

    Science.gov (United States)

    2012-12-01

    Negative externalities have competitive relevance in a market when they have selective impacts as, for : example, when a product in use imposes greater costs on consumers of rival products than on other people. : Because managers have discretion ...

  15. Negative ion formation processes: A general review

    International Nuclear Information System (INIS)

    Alton, G.D.

    1990-01-01

    The principal negative ion formation processes will be briefly reviewed. Primary emphasis will be placed on the more efficient and universal processes of charge transfer and secondary ion formation through non-thermodynamic surface ionization. 86 refs., 20 figs

  16. Unrevealing culture-negative severe sepsis

    OpenAIRE

    de Prost, Nicolas; Razazi, Keyvan; Brun-Buisson, Christian

    2013-01-01

    Sepsis involves a wide array of sources and microorganisms, only a fraction of which are microbiologically documented. Culture-negative sepsis poses special diagnostic challenges to both clinicians and microbiologists and further questions the validity of sepsis definitions.

  17. Contingent negative variation of mood disorder patients

    Institute of Scientific and Technical Information of China (English)

    Yingzhi Lu; Wenbin Zong; Qingtao Ren; Jinyu Pu; Jun Chen; Juan Li; Xingshi Chen; Yong Wang

    2011-01-01

    Studies on brain-evoked potential and contingent negative variation (CNV) in mood disorder remain controversial. To date, no CNV difference between unipolar and bipolar depression has been reported. Brain-evoked potentials were measured in the present study to analyze CNV in three subtypes of mood disorder (mania, unipolar depression, and bipolar depression), and these results were compared with normal controls. In the mania group, CNV amplitude B was greater than in controls, and the depression group exhibited lower CNV amplitude B and smaller A-S'2 area, and prolonged post-imperative negative variation latency. The CNV comparison between unipolar and bipolar depression found that the prolonged post-imperative negative variation latency was only in unipolar depression. These results suggest that prolonged post-imperative negative variation latency is a characteristic of unipolar depression, and CNV amplitude change is a state characteristic of mood disorder patients.

  18. Factors that negatively influence consumption of traditionally ...

    African Journals Online (AJOL)

    Factors that negatively influence consumption of traditionally fermented milk ... in various countries of sub-Saharan Africa and a number of health benefits to human ... influence consumption of Mursik, a traditionally fermented milk product from ...

  19. Veillonella, Firmicutes: Microbes disguised as Gram negatives

    DEFF Research Database (Denmark)

    Vesth, Tammi Camilla; Ozen, Asli; Andersen, Sandra Christine

    2013-01-01

    Negativicutes, including the genus Veillonella, stain Gram negative. Veillonella are among the most abundant organisms of the oral and intestinal microflora of animals and humans, in spite of being strict anaerobes. In this work, the genomes of 24 Negativicutes, including eight Veillonella spp., are compared......, with the exception of a shared LPS biosynthesis pathway. The clade within the class Negativicutes to which the genus Veillonella belongs exhibits unique properties, most of which are in common with Gram-positives and some with Gram negatives. They are only distantly related to Clostridia, but are even less closely...... related to Gram-negative species. Though the Negativicutes stain Gram-negative and possess two membranes, the genome and proteome analysis presented here confirm their place within the (mainly) Gram positive phylum of the Firmicutes. Further studies are required to unveil the evolutionary history...

  20. Dispersion characteristics of negative refraction sonic crystals

    International Nuclear Information System (INIS)

    Wu, L.-Y.; Chen, L.-W.; Wang, R.C.-C.

    2008-01-01

    Dispersion characteristics of negative refraction sonic crystals are investigated. The plane wave expansion method is used to calculate the equifrequency surface; the dependences of refractive direction on frequencies and incident angles for triangular lattices are shown. There exist the positive and negative refractive waves which include k.V g ≥0 and k.V g ≤0 in the second band for the triangular system. We also use the finite element method to demonstrate that the relative intensity of the transmitted acoustic waves is dependent on incident frequencies and angles. The positions of the partial band gaps obtained by the plane wave expansion method are in good agreement with those obtained by the finite element method. The sonic crystals with negative effective index are shown to have higher transmission intensities. By using the negative refraction behavior, we can design a sonic crystal plane lens to focus a sonic wave

  1. Negative muon capture in noble gas mixtures

    International Nuclear Information System (INIS)

    Hutson, R.L.; Knight, J.D.; Leon, M.; Schillaci, M.E.; Knowles, H.B.; Reidy, J.J.

    1980-01-01

    We have determined the probabilities of atomic negative muon capture in binary mixtures of the gases He, Ne, Ar, and Kr at partial pressures near five atmospheres. Relative capture rates were deduced from measured muonic X-ray yields. (orig.)

  2. On negative norm states in supersymmetric theories

    International Nuclear Information System (INIS)

    Ellwanger, U.

    1983-01-01

    We study the effective kinetic energy of scalar fields for two classes of supersymmetric theories. In theories with very large VEVs of scalar fields, as proposed by Witten, the use of the renormalization group improved effective action prevents the appearance of negative norm states. For simpler theories a general criterium for the absence of negative norm states is given, which is violated in a model with O(N)-symmetry proposed recently. (orig.)

  3. Consumer's Negative emotions, Financial Decisions, Financial Advice

    OpenAIRE

    Konstantaki, Violetta

    2007-01-01

    Abstract The purpose of this study is to explore the consumers decision making process. In particular, this study attempts to examine consumers negative emotions, which elicit during a decision processing. Especially, the case of a financial decision will be examined. Moreover, consumers negative emotion will be investigated in relation with consumers coping behaviour. To be more specific, the option of seeking advice as a successful consumers coping behaviour will be explor...

  4. Negative reciprocity and retrenched pension rights

    OpenAIRE

    Montizaan, R.M.; Cörvers, F.; de Grip, A.; Dohmen, T.J.

    2012-01-01

    We document the importance of negatively reciprocal inclinations in labor relationships by showing that a retrenchment of pension rights, which is perceived as unfair, causes a larger reduction in job motivation the stronger workers' negatively reciprocal inclinations are. We exploit unique matched survey and administrative data on male employees in the public sector in the Netherlands and compare the job motivation of employees born in 1950, who faced a substantial retrenchment of their pens...

  5. Superconductive microstrip exhibiting negative differential resistivity

    International Nuclear Information System (INIS)

    Huebener, R.P.; Gallus, D.E.

    1975-01-01

    A device capable of exhibiting negative differential electrical resistivity over a range of values of current and voltage is formed by vapor-depositing a thin layer of a material capable of exhibiting superconductivity on an insulating substrate, establishing electrical connections at opposite ends of the deposited strip, and cooling the alloy into its superconducting range. The device will exhibit negative differential resistivity when biased in the current-induced resistive state

  6. Negative ion sound solitary waves revisited

    Science.gov (United States)

    Cairns, R. A.; Cairns

    2013-12-01

    Some years ago, a group including the present author and Padma Shukla showed that a suitable non-thermal electron distribution allows the formation of ion sound solitary waves with either positive or negative density perturbations, whereas with Maxwellian electrons only a positive density perturbation is possible. The present paper discusses the qualitative features of this distribution allowing the negative waves and shared with suitable two-temperature distributions.

  7. Negative pressure pulmonary oedema after septoplasty.

    Science.gov (United States)

    García de Hombre, Alina M; Cuffini, Alejandro; Bonadeo, Alejandro

    2013-01-01

    Negative pressure pulmonary oedema (NPPO) is an anaesthetic complication due to acute obstruction of the upper airway, whose main cause is laryngospasm. The pathophysiology involves a strong negative intrapleural pressure during inspiration against a closed glottis, which triggers excessive pressure in the pulmonary microvasculature. Although its diagnosis can be difficult, its recognition helps to minimise morbidity and mortality. This article presents a case of NPPO due to postextubation laryngospasm. Copyright © 2011 Elsevier España, S.L. All rights reserved.

  8. The Brief Negative Symptom Scale: Psychometric Properties

    OpenAIRE

    Kirkpatrick, Brian; Strauss, Gregory P.; Nguyen, Linh; Fischer, Bernard A.; Daniel, David G.; Cienfuegos, Angel; Marder, Stephen R.

    2010-01-01

    The participants in the NIMH-MATRICS Consensus Development Conference on Negative Symptoms recommended that an instrument be developed that measured blunted affect, alogia, asociality, anhedonia, and avolition. The Brief Negative Symptom Scale (BNSS) is a 13-item instrument designed for clinical trials and other studies that measures these 5 domains. The interrater, test–retest, and internal consistency of the instrument were strong, with respective intraclass correlation coefficients of 0.93...

  9. Negative ion formation and neutralization processes, (1)

    International Nuclear Information System (INIS)

    Sugiura, Toshio

    1982-01-01

    This review has been made preliminary for the purpose of contribute to the plasma heating by ''negative ion based neutral beam injection'' in the magnetic confinement fusion reactor. A compilation includes the survey of the general processes of negative ion formation, the data of the cross section of H - ion formation and the neutralization of H - ion, and some of new processes of H - ion formation. The data of cross section are mainly experimental, but partly include the results of theoretical calculation. (author)

  10. Negative brain scintigrams in brain tumors

    International Nuclear Information System (INIS)

    Dalke, K.G.

    1978-01-01

    With 53 histologically verified and 2 histologically not identified brain tumors, that showed a negative scintigram, it was tried to find reasons for the wrong and negative dropout of these scintigrams. The electroencephalograms and angiograms, that were made simultaneously were taken into consideration with respect to their propositional capability and were compared with the scintigram findings. For the formation of the negative brain scintigrams there could be found no unique cause or causal constellation. The scintigraphic tumor representation is likely based on a complex process. Therefore the reasons for the negativity of the brain scintigrams can be a manifold of causes. An important role plays the vascularisation of the tumor, but not in a sole way. As well the tumor localisation gains some importance; especially in the temporal lobe or in the deeper structures situated tumors can be negative in the scintigram. To hold down the rate of wrong-negative quote in the case of intracranial tumor search, one is advised to continue with an further exposure after 2 to 4 hours besides the usual exposures, unless a sequential scintigraphy was made from the beginning. (orig./MG) [de

  11. The Peculiar Negative Greenhouse Effect Over Antarctica

    Science.gov (United States)

    Sejas, S.; Taylor, P. C.; Cai, M.

    2017-12-01

    Greenhouse gases warm the climate system by reducing the energy loss to space through the greenhouse effect. Thus, a common way to measure the strength of the greenhouse effect is by taking the difference between the surface longwave (LW) emission and the outgoing LW radiation. Based on this definition, a paradoxical negative greenhouse effect is found over the Antarctic Plateau, which suprisingly indicates that greenhouse gases enhance energy loss to space. Using 13 years of NASA satellite observations, we verify the existence of the negative greenhouse effect and find that the magnitude and sign of the greenhouse effect varies seasonally and spectrally. A previous explanation attributes the negative greenhouse effect solely to stratospheric CO2 and warmer than surface stratospheric temperatures. However, we surprisingly find that the negative greenhouse effect is predominantly caused by tropospheric water vapor. A novel principle-based explanation provides the first complete account of the Antarctic Plateau's negative greenhouse effect indicating that it is controlled by the vertical variation of temperature and greenhouse gas absorption strength. Our findings indicate that the strong surface-based temperature inversion and scarcity of free tropospheric water vapor over the Antarctic Plateau cause the negative greenhouse effect. These are climatological features uniquely found in the Antarctic Plateau region, explaining why the greenhouse effect is positive everywhere else.

  12. A model for negative ion extraction and comparison of negative ion optics calculations to experimental results

    International Nuclear Information System (INIS)

    Pamela, J.

    1990-10-01

    Negative ion extraction is described by a model which includes electron diffusion across transverse magnetic fields in the sheath. This model allows a 2-Dimensional approximation of the problem. It is used to introduce electron space charge effects in a 2-D particle trajectory code, designed for negative ion optics calculations. Another physical effect, the stripping of negative ions on neutral gas atoms, has also been included in our model; it is found to play an important role in negative ion optics. The comparison with three sets of experimental data from very different negative ion accelerators, show that our model is able of accurate predictions

  13. What makes dreams positive or negative: relations to fundamental dimensions of positive and negative mood.

    Science.gov (United States)

    Kallmeyer, R J; Chang, E C

    1998-02-01

    The present study examined the general emotional content of dreams reported by individuals who typically experience "positive" versus "negative" dreams. Self-reports of the 153 participants indicated that positive versus negative dreamers (ns = 42 and 24, respectively) generally experienced more positive emotions, e.g., joviality, self-assurance, and fewer negative emotions, e.g., fear, sadness. No differences were found in the self-reports of the participants in the experience of surprise, guilt, fatigue, and shyness between the groups, hence, positive and negative dreams do not appear to reflect simply more positive and fewer negative emotions, respectively.

  14. The Interplay Among Children's Negative Family Representations, Visual Processing of Negative Emotions, and Externalizing Symptoms.

    Science.gov (United States)

    Davies, Patrick T; Coe, Jesse L; Hentges, Rochelle F; Sturge-Apple, Melissa L; van der Kloet, Erika

    2018-03-01

    This study examined the transactional interplay among children's negative family representations, visual processing of negative emotions, and externalizing symptoms in a sample of 243 preschool children (M age  = 4.60 years). Children participated in three annual measurement occasions. Cross-lagged autoregressive models were conducted with multimethod, multi-informant data to identify mediational pathways. Consistent with schema-based top-down models, negative family representations were associated with attention to negative faces in an eye-tracking task and their externalizing symptoms. Children's negative representations of family relationships specifically predicted decreases in their attention to negative emotions, which, in turn, was associated with subsequent increases in their externalizing symptoms. Follow-up analyses indicated that the mediational role of diminished attention to negative emotions was particularly pronounced for angry faces. © 2017 The Authors. Child Development © 2017 Society for Research in Child Development, Inc.

  15. [Negative hallucination, self-onsciousness and ageing].

    Science.gov (United States)

    Hazif-Thomas, C; Stephan, F; Walter, M; Thomas, P

    2015-04-01

    Negative hallucinations are characterized by a defect in perception of an object or a person, or a denial of the existence of their perception. Negative hallucinations create blank spaces, due to both an impossible representation and an incapability of investment in reality. They have a close relationship with Cotard's syndrome, delusional theme of organ denial observed in melancholic syndromes in the elderly. Phenomenological approach. The phenomenology of negative hallucinations provides quite an amount of information on the origin of the psychotic symptoms when one is rather old. The connections between hallucinations, mood disorders and negative symptoms are often difficult to live with for the nearest and dearest. Negative hallucinations require a strict approach to identify their expression that is crucial because a wide heterogeneity exists within the pathological pictures, as in Cotard's syndrome. Although the negative hallucination has an anti traumatic function in elderly people fighting against mental pain, it still represents a deficiency in symbolization. The prevalence of this symptom is without doubt underestimated, although its presence often underlines thymic suffering that is more striking. These hallucinatory symptoms have an important impact on the patients' daily life, and they appear to be prisoners of a suffering, which cannot be revealed. We propose in this article to review the clinical symptoms of negative hallucinations in the elderly and the way to manage them. The medicinal approaches are not always effective. A greater place must be given to what is in connection with the body, aiming at a strong impact and thus to offer non-pharmacological approaches, such as somatic ones, which can be either invasive (electroconvulsive therapy) or not (transcranial magnetic stimulation). Copyright © 2014. Published by Elsevier Masson SAS.

  16. Exclusion of identification by negative superposition

    Directory of Open Access Journals (Sweden)

    Takač Šandor

    2012-01-01

    Full Text Available The paper represents the first report of negative superposition in our country. Photo of randomly selected young, living woman was superimposed on the previously discovered female skull. Computer program Adobe Photoshop 7.0 was used in work. Digitilized photographs of the skull and face, after uploaded to computer, were superimposed on each other and displayed on the monitor in order to assess their possible similarities or differences. Special attention was payed to matching the same anthropometrical points of the skull and face, as well as following their contours. The process of fitting the skull and the photograph is usually started by setting eyes in correct position relative to the orbits. In this case, lower jaw gonions go beyond the face contour and gnathion is highly placed. By positioning the chin, mouth and nose their correct anatomical position cannot be achieved. All the difficulties associated with the superposition were recorded, with special emphasis on critical evaluation of work results in a negative superposition. Negative superposition has greater probative value (exclusion of identification than positive (possible identification. 100% negative superposition is easily achieved, but 100% positive - almost never. 'Each skull is unique and viewed from different perspectives is always a new challenge'. From this point of view, identification can be negative or of high probability.

  17. Positive rights, negative rights and health care.

    Science.gov (United States)

    Bradley, Andrew

    2010-12-01

    In the current debate about healthcare reform in the USA, advocates for government-ensured universal coverage assume that health care is a right. Although this position is politically popular, it is sometimes challenged by a restricted view of rights popular with libertarians and individualists. The restricted view of rights only accepts 'negative' rights as legitimate rights. Negative rights, the argument goes, place no obligations on you to provide goods to other people and thus respect your right to keep the fruits of your labour. A classic enumeration of negative rights includes life, liberty, and the pursuit of happiness. Positive rights, by contrast, obligate you either to provide goods to others, or pay taxes that are used for redistributive purposes. Health care falls into the category of positive rights since its provision by the government requires taxation and therefore redistribution. Therefore, the libertarian or individualist might argue that health care cannot be a true right. This paper rejects the distinction between positive and negative rights. In fact, the protection of both positive and negative rights can place obligations on others. Furthermore, because of its role in helping protect equality of opportunity, health care can be tied to the rights to life, liberty, and the pursuit of happiness. There is, therefore, good reason to believe that health care is a human right and that universal access should be guaranteed. The practical application, by governments and non-governmental organisations, of several of the arguments presented in this paper is also discussed.

  18. NEVER forget: negative emotional valence enhances recapitulation.

    Science.gov (United States)

    Bowen, Holly J; Kark, Sarah M; Kensinger, Elizabeth A

    2017-07-10

    A hallmark feature of episodic memory is that of "mental time travel," whereby an individual feels they have returned to a prior moment in time. Cognitive and behavioral neuroscience methods have revealed a neurobiological counterpart: Successful retrieval often is associated with reactivation of a prior brain state. We review the emerging literature on memory reactivation and recapitulation, and we describe evidence for the effects of emotion on these processes. Based on this review, we propose a new model: Negative Emotional Valence Enhances Recapitulation (NEVER). This model diverges from existing models of emotional memory in three key ways. First, it underscores the effects of emotion during retrieval. Second, it stresses the importance of sensory processing to emotional memory. Third, it emphasizes how emotional valence - whether an event is negative or positive - affects the way that information is remembered. The model specifically proposes that, as compared to positive events, negative events both trigger increased encoding of sensory detail and elicit a closer resemblance between the sensory encoding signature and the sensory retrieval signature. The model also proposes that negative valence enhances the reactivation and storage of sensory details over offline periods, leading to a greater divergence between the sensory recapitulation of negative and positive memories over time. Importantly, the model proposes that these valence-based differences occur even when events are equated for arousal, thus rendering an exclusively arousal-based theory of emotional memory insufficient. We conclude by discussing implications of the model and suggesting directions for future research to test the tenets of the model.

  19. Emotionally negative pictures enhance gist memory.

    Science.gov (United States)

    Bookbinder, S H; Brainerd, C J

    2017-02-01

    In prior work on how true and false memory are influenced by emotion, valence and arousal have often been conflated. Thus, it is difficult to say which specific effects are caused by valence and which are caused by arousal. In the present research, we used a picture-memory paradigm that allowed emotional valence to be manipulated with arousal held constant. Negatively valenced pictures elevated both true and false memory, relative to positive and neutral pictures. Conjoint recognition modeling revealed that negative valence (a) reduced erroneous suppression of true memories and (b) increased the familiarity of the semantic content of both true and false memories. Overall, negative valence impaired the verbatim side of episodic memory but enhanced the gist side, and these effects persisted even after a week-long delay. (PsycINFO Database Record (c) 2017 APA, all rights reserved).

  20. Nature of negative microplastic deformation in alloys

    International Nuclear Information System (INIS)

    Palatnik, L.S.; Ivantsov, V.I.; Kagan, Ya.I.; Papirov, I.I.; Fat'yanova, N.B.; AN Ukrainskoj SSR, Kharkov. Fiziko-Tekhnicheskij Inst.)

    1985-01-01

    The paper deals with investigation of microplastic deformation of corrosion resistant aging 40KhNYU alloy and the study of physical nature of negative microdeformation in this alloy under tension. Investigation of microplasticity of 40KhNYU alloy was conducted by the method of mechanostatic hysteresis using resistance strain gauge for measuring stresses and deformations. Microplasticity curves for 40KhNYU alloy were obtained. They represent the result of competition between usual (positive) microdeformation and phase (negative) deformation under tensile effect on the alloy. It was established that the negative microdeformation increment occurs during secondary aging of the phase precipitated from initial supersat urated solid solution (primary decomposition product). This phase decomposes under tension with disperse phase precipitation which promotes decreasing its specific volume and specimen volume as a whole

  1. Negative capacitance in a ferroelectric capacitor.

    Science.gov (United States)

    Khan, Asif Islam; Chatterjee, Korok; Wang, Brian; Drapcho, Steven; You, Long; Serrao, Claudy; Bakaul, Saidur Rahman; Ramesh, Ramamoorthy; Salahuddin, Sayeef

    2015-02-01

    The Boltzmann distribution of electrons poses a fundamental barrier to lowering energy dissipation in conventional electronics, often termed as Boltzmann Tyranny. Negative capacitance in ferroelectric materials, which stems from the stored energy of a phase transition, could provide a solution, but a direct measurement of negative capacitance has so far been elusive. Here, we report the observation of negative capacitance in a thin, epitaxial ferroelectric film. When a voltage pulse is applied, the voltage across the ferroelectric capacitor is found to be decreasing with time--in exactly the opposite direction to which voltage for a regular capacitor should change. Analysis of this 'inductance'-like behaviour from a capacitor presents an unprecedented insight into the intrinsic energy profile of the ferroelectric material and could pave the way for completely new applications.

  2. Entanglement negativity bounds for fermionic Gaussian states

    Science.gov (United States)

    Eisert, Jens; Eisler, Viktor; Zimborás, Zoltán

    2018-04-01

    The entanglement negativity is a versatile measure of entanglement that has numerous applications in quantum information and in condensed matter theory. It can not only efficiently be computed in the Hilbert space dimension, but for noninteracting bosonic systems, one can compute the negativity efficiently in the number of modes. However, such an efficient computation does not carry over to the fermionic realm, the ultimate reason for this being that the partial transpose of a fermionic Gaussian state is no longer Gaussian. To provide a remedy for this state of affairs, in this work, we introduce efficiently computable and rigorous upper and lower bounds to the negativity, making use of techniques of semidefinite programming, building upon the Lagrangian formulation of fermionic linear optics, and exploiting suitable products of Gaussian operators. We discuss examples in quantum many-body theory and hint at applications in the study of topological properties at finite temperature.

  3. Backscattering and negative polarization of agglomerate particles.

    Science.gov (United States)

    Zubko, Evgenij; Shkuratov, Yuriy; Hart, Matthew; Eversole, Jay; Videen, Gorden

    2003-09-01

    We used the discrete dipole approximation to study the backscattering of agglomerate particles consisting of oblong monomers. We varied the aspect ratio of the monomers from approximately 1 (sphere) to 4, while we kept the total particle volume equivalent to that of an x = 10 sphere for m = 1.59 + i0 and 1.50 + i0 and considered two values of agglomerate packing density: rho = 0.25 and rho = 0.1. We found that these particles do not display a prominent brightness opposition effect but do produce significant negative polarization over a range of near-backscattering angles. Increasing the monomers' aspect ratio can make the negative polarization much more prominent. We have noted also that decreasing m and p can reduce the amplitude of the negative polarization for these particles.

  4. Classical fluids of negative heat capacity

    Energy Technology Data Exchange (ETDEWEB)

    Landsberg, P.T. [Southampton Univ., (United Kingdom). Faculty of Mathematical Studies; Woodard, R.P. [Florida Univ., Gainesville, FL (United States). Dept. of Physics

    1992-06-01

    It is shown that new parameters X can be defined such that the heat capacity C{sub X} {equivalent_to} T({partial_derivative}S/{partial_derivative}T)X is negative, even when the canonical ensemble (i.e. at fixed T = ({partial_derivative}U/{partial_derivative}S) and Y {ne} X) is stable. As examples we treat black body radiation and general gas systems with nonsingular {kappa}{sub T}. For the case of a simple ideal gas we even exhibit an apparatus which enforces a constraint X(p,V) = const. that makes C{sub X} < 0. Since it is possible to invent constraints for which canonically stable systems have negative heat capacity we speculate that it may also be possible to infer the statistical mechanics of canonically unstable systems - for which even the traditional heat capacities are negative - by imposing constraints that stabilize the associated, inoncanonical ensembles.

  5. Classical fluids of negative heat capacity

    Energy Technology Data Exchange (ETDEWEB)

    Landsberg, P.T. (Southampton Univ., (United Kingdom). Faculty of Mathematical Studies); Woodard, R.P. (Florida Univ., Gainesville, FL (United States). Dept. of Physics)

    1992-06-01

    It is shown that new parameters X can be defined such that the heat capacity C{sub X} {equivalent to} T({partial derivative}S/{partial derivative}T)X is negative, even when the canonical ensemble (i.e. at fixed T = ({partial derivative}U/{partial derivative}S) and Y {ne} X) is stable. As examples we treat black body radiation and general gas systems with nonsingular {kappa}{sub T}. For the case of a simple ideal gas we even exhibit an apparatus which enforces a constraint X(p,V) = const. that makes C{sub X} < 0. Since it is possible to invent constraints for which canonically stable systems have negative heat capacity we speculate that it may also be possible to infer the statistical mechanics of canonically unstable systems - for which even the traditional heat capacities are negative - by imposing constraints that stabilize the associated, inoncanonical ensembles.

  6. News Media Framing of Negative Campaigning

    DEFF Research Database (Denmark)

    Pedersen, Rasmus Tue

    2014-01-01

    that news coverage of negative campaigning does apply the strategic game frame to a significantly larger degree than articles covering positive campaigning. This finding has significant implications for campaigning politicians and for scholars studying campaign and media effects.......News media coverage of election campaigns is often characterized by use of the strategic game frame and a focus on politicians’ use of negative campaigning. However, the exact relationship between these two characteristics of news coverage is largely unexplored. This article theorizes that consumer...... demand and norms of journalistic independence might induce the news media outlets to cover negative campaigning with a strategic game frame. A comprehensive content analysis based on several newspaper types, several election campaigns, and several different measurements of media framing confirms...

  7. Preservation Copying Endangered Historic Negative Collections

    DEFF Research Database (Denmark)

    Kejser, Ulla Bøgvad

    2008-01-01

    This article discusses preservation copying of unstable B&W nitrate and acetate still photographic negatives. It focuses on evaluating two different strategies for preserving the copies from a point of view of quality and cost-effectiveness. The evaluated strategies are preservation of the master...... by describing essential characteristics of negatives, which must be passed on to the copies, and the required metadata and technical imaging specifications. Next the paper discusses strategies for preservation and makes an analysis with the LIFE2 Costing Model. The paper concludes that the most beneficial...... and cost-effective preservation solution for large format negatives is to keep the preservation copies as digital files. However, it also acknowledges that it is important to revisit such strategies regularly to monitor changes in user expectations, technologies and costs....

  8. Goffman, Parsons, and the Negational Self

    Directory of Open Access Journals (Sweden)

    James J. Chriss

    2015-01-01

    Full Text Available Erving Goffman’s emphasis on impression management in everyday life means that for the most part persons offer only partial or incomplete glimpses of themselves. Indeed, under specifiable conditions self-presentations may take the form of a negational self. If negational selves exist at the person or individual level, then they must also exist at the collective level (that is, if we are to take seriously such notions as the social mind, collective representations, or even culture. Understandings of how this negational self appears and is produced at various analytical levels (micro, meso, and macro can be anchored via a conceptual schema which merges Goffman’s own identity typology with the three-world model of Jürgen Habermas by way of Talcott Parsons.

  9. Modeling of Trichel pulses in negative corona

    International Nuclear Information System (INIS)

    Napartovich, A.P.; Akishev, Yu. S.; Deryugin, A.A.; Kochetov, I.V.; Pan'kin, M.V.; Trushkin, N.I.

    1998-01-01

    Results are reported of detailed numerical studies of Trichel pulse formation for dry air in short-gap coronas. Continuity equations for electrons, positive and negative ions, and the Poisson equation averaged over the current cross section were solved numerically with appropriate boundary conditions. The results of numerical simulation make it possible to analyze in detail the trailing edge of the Trichel pulse and the inter-pulse pause determining the period between pulses. In particular, the variations of the total number of negative ions in the corona spacing occurring under typical conditions of a pulsating corona, proved to be quite insignificant. A comparison with experiments demonstrated a reasonable agreement both for the shape of the pulse and for the average characteristics of the negative corona. (J.U.)

  10. Thunderstorm Charge Structures Producing Negative Gigantic Jets

    Science.gov (United States)

    Boggs, L.; Liu, N.; Riousset, J. A.; Shi, F.; Rassoul, H.

    2016-12-01

    Here we present observational and modeling results that provide insight into thunderstorm charge structures that produce gigantic jet discharges. The observational results include data from four different thunderstorms producing 9 negative gigantic jets from 2010 to 2014. We used radar, very high frequency (VHF) and low frequency (LF) lightning data to analyze the storm characteristics, charge structures, and lightning activity when the gigantic jets emerged from the parent thunderstorms. A detailed investigation of the evolution of one of the charge structures by analyzing the VHF data is also presented. The newly found charge structure obtained from the observations was analyzed with fractal modeling and compared with previous fractal modeling studies [Krehbiel et al., Nat. Geosci., 1, 233-237, 2008; Riousset et al., JGR, 115, A00E10, 2010] of gigantic jet discharges. Our work finds that for normal polarity thunderstorms, gigantic jet charge structures feature a narrow upper positive charge region over a wide middle negative charge region. There also likely exists a `ring' of negative screening charge located around the perimeter of the upper positive charge. This is different from previously thought charge structures of the storms producing gigantic jets, which had a very wide upper positive charge region over a wide middle negative charge region, with a very small negative screening layer covering the cloud top. The newly found charge structure results in leader discharge trees in the fractal simulations that closely match the parent flashes of gigantic jets inside and outside the thundercloud. The previously used charge structures, while vital to the understanding of gigantic jet initiation and the role of charge imbalances inside the cloud, do not produce leader discharge trees that agree with observed gigantic jet discharges.Finally, the newly discovered gigantic jet charge structures are formed near the end of a convective pulse [Meyer et al., JGR, 118

  11. Negative contrast peritoneography in the horse

    International Nuclear Information System (INIS)

    Lloyd, K.C.K.; Kerr, L.Y.; Meagher, D.M.; Baker, T.W.; Kurpershoek, C.J.

    1989-01-01

    A method of negative contrast peritoneography using CO 2 peritoneal insufflation technique was investigated in adult horses. Radiographic visualization of anatomic structures in the dorsal abdomen, including the kidneys, portions of the spleen and liver, dorsal stomach and mesenteric root region, was enhanced. Visualization of ventral abdominal structures was not enhanced. Negative contrast peritoneography allowed reduction in the radiographic technique from 140 kVp and 40 mAs before insufflation to 100 kVp and 5–10 mAs following insufflation. The technique was easily and safely performed with minimal patient discomfort and risk

  12. Negative Ion Sources: Magnetron and Penning

    International Nuclear Information System (INIS)

    Faircloth, D C

    2013-01-01

    The history of the magnetron and Penning electrode geometry is briefly outlined. Plasma generation by electrical discharge-driven electron impact ionization is described and the basic physics of plasma and electrodes relevant to magnetron and Penning discharges are explained. Negative ions and their applications are introduced, along with their production mechanisms. Caesium and surface production of negative ions are detailed. Technical details of how to build magnetron and Penning surface plasma sources are given, along with examples of specific sources from around the world. Failure modes are listed and lifetimes compared. (author)

  13. Necessity of negativity in quantum theory

    International Nuclear Information System (INIS)

    Ferrie, Christopher; Morris, Ryan; Emerson, Joseph

    2010-01-01

    A unification of the set of quasiprobability representations using the mathematical theory of frames was recently developed for quantum systems with finite-dimensional Hilbert spaces, in which it was proven that such representations require negative probability in either the states or the effects. In this article we extend those results to Hilbert spaces of infinite dimension, for which the celebrated Wigner function is a special case. Hence, this article presents a unified framework for describing the set of possible quasiprobability representations of quantum theory, and a proof that the presence of negativity is a necessary feature of such representations.

  14. Negative Ion Sources: Magnetron and Penning

    CERN Document Server

    Faircloth, D.C.

    2013-12-16

    The history of the magnetron and Penning electrode geometry is briefly outlined. Plasma generation by electrical discharge-driven electron impact ionization is described and the basic physics of plasma and electrodes relevant to magnetron and Penning discharges are explained. Negative ions and their applications are introduced, along with their production mechanisms. Caesium and surface production of negative ions are detailed. Technical details of how to build magnetron and Penning surface plasma sources are given, along with examples of specific sources from around the world. Failure modes are listed and lifetimes compared.

  15. Negative refraction using Raman transitions and chirality

    Energy Technology Data Exchange (ETDEWEB)

    Sikes, D. E.; Yavuz, D. D. [Department of Physics, 1150 University Avenue, University of Wisconsin at Madison, Madison, Wisconsin 53706 (United States)

    2011-11-15

    We present a scheme that achieves negative refraction with low absorption in far-off resonant atomic systems. The scheme utilizes Raman resonances and does not require the simultaneous presence of an electric-dipole transition and a magnetic-dipole transition near the same wavelength. We show that two interfering Raman tran-sitions coupled to a magnetic-dipole transition can achieve a negative index of refraction with low absorption through magnetoelectric cross-coupling. We confirm the validity of the analytical results with exact numerical simulations of the density matrix. We also discuss possible experimental implementations of the scheme in rare-earth metal atomic systems.

  16. Proactive and Retroactive Effects of Negative Suggestion

    Science.gov (United States)

    Brown, Alan S.; Brown, Christine M.; Mosbacher, Joy L.; Dryden, W. Erich

    2006-01-01

    The negative effects of false information presented either prior to (proactive interference; PI) or following (retroactive interference; RI) true information was examined with word definitions (Experiment 1) and trivia facts (Experiment 2). Participants were explicitly aware of which information was true and false when shown, and true-false…

  17. [Negative symptoms in schizophrenia: psychotherapeutic approaches].

    Science.gov (United States)

    Azorin, J-M; Adida, M; Belzeaux, R; Pringuey, D; Micoulaud Franchi, J-A; Simon, N; Cermolacce, M; Kaladjian, A; Fakra, E

    2015-12-01

    Although negative symptoms are recognized as a central feature of schizophrenia, their definition as well as phenomenology have long been a vexing issue. During these last years, a major progress has been made with the delineation of two underlying subdomains of negative symptoms: diminished expression and anhedonia-avolition-apathy. As current guidelines are not always in accord on the efficacy of treatments on negative symptoms, it may be tempting to re-interpret the findings of clinical trials by looking at the effects of treatments on these two subdomains. This could concern both psychotropic treatments and psychotherapeutic interventions. Furthermore, neuroimaging as well as emotional response studies have permitted to better understand the mechanism which could be at the root of diminished expression and anhedonia in schizophrenia. On this basis, new psychotherapeutic methods have been devised which, by specifically targeting these two subdomains, are likely to be more efficient on negative symptoms. Further research is warranted to test their efficacy in randomized controlled trials. Copyright © 2015 Elsevier Masson SAS. All rights reserved.

  18. [Negative symptoms of schizophrenia: historical aspects].

    Science.gov (United States)

    Pringuey, D; Paquin, N; Cherikh, F; Giordana, B; Belzeaux, R; Cermolacce, M; Adida, M; Azorin, J-M

    2015-12-01

    The history of negative symptoms of schizophrenia rises early days of medicine in clinical and pathophysiological differences between positive and negative and their complex joint. Forming a set of typical core of symptoms, and some feature of a syndrome belonging to a specific pathophysiological mechanism, negative symptoms of schizophrenia emerge from old descriptions of clinical pictures, related to the overall look of madness, the heart of alienation, a central sign of early dementia, gradually more precisely describing the strange nature of the autistic withdrawal and schizophrenic apragmatism. At therapeutic era, negative symptoms have taken over the positive symptoms to establish an operational criteria whose importance lies in the progressive severity of this clinical type and in their contribution to therapeutic resistance. Despite the efforts of modern typological classifications, this work rehabilitates the old concept of "unitary psychosis" by defining a common symptomatic core to multiple clinical forms of psychosis, combining deficit of emotional expression and avolition, meaning a native psychopathology and a pathophysiology possibly in a common final way, and calling the arrival of new treatment strategies. Copyright © 2015 Elsevier Masson SAS. All rights reserved.

  19. Cortical evidence for negative search templates

    NARCIS (Netherlands)

    Reeder, Reshanne R.; Olivers, Christian N.L.; Pollmann, Stefan

    2017-01-01

    A “target template”, specifying target features, is thought to benefit visual search performance. Setting up a “negative template”, specifying distractor features, should improve distractor inhibition and also benefit target detection. In the current fMRI study, subjects were required to search for

  20. Suicidal Fantasies and Positive/Negative Effects.

    Science.gov (United States)

    Fouts, Gregory; Norrie, Janice

    This study attempted to provide some initial normative data to help professionals and researchers to distinguish between playful and stimulating suicidal fantasies as opposed to serious and compulsive thoughts and behaviours characterized by negative affects. It is argued that the former is a natural consequence of cognitive development, the entry…

  1. On affine non-negative matrix factorization

    DEFF Research Database (Denmark)

    Laurberg, Hans; Hansen, Lars Kai

    2007-01-01

    We generalize the non-negative matrix factorization (NMF) generative model to incorporate an explicit offset. Multiplicative estimation algorithms are provided for the resulting sparse affine NMF model. We show that the affine model has improved uniqueness properties and leads to more accurate id...

  2. Quantum Heat Engine and Negative Boltzmann Temperature

    International Nuclear Information System (INIS)

    Xi Jing-Yi; Quan Hai-Tao

    2017-01-01

    To clarify the ambiguity on negative Boltzmann temperature in literature, we study the Carnot and the Otto cycle with one of the heat reservoirs at the negative Boltzmann temperature based on a canonical ensemble description. The work extraction, entropy production and the efficiency of these cycles are explored. Conditions for constructing and properties of these thermodynamic cycles are elucidated. We find that the apparent “violation” of the second law of thermodynamics in these cycles are due to the fact that the traditional definition of thermodynamic efficiency is inappropriate in this situation. When properly understanding the efficiency and the adiabatic processes, in which the system crosses over “absolute ZERO” in a limit sense, the Carnot cycle with one of the heat reservoirs at a negative Boltzmann temperature can be understood straightforwardly, and it contradicts neither the second nor the third law of thermodynamics. Hence, negative Boltzmann temperature is a consistent concept in thermodynamics. We use a two-level system and an Ising spin system to illustrate our central results. (paper)

  3. Negative freedom and the liberal paradoxes

    NARCIS (Netherlands)

    van Hees, M.V.B.P.M

    In their game-theoretic formulations, the liberal paradoxes of Amartya Sm and Alan Gibbard show a tension between freedom on the one hand, and Pareto optimality and stability on the other. This article examines what happens to the liberal paradoxes if a negative conception of freedom is used. Given

  4. Revisiting the gram-negative lipoprotein paradigm

    Science.gov (United States)

    The processing of lipoproteins (lpps) in Gram-negative bacteria is generally considered to be an essential pathway. Mature lipoproteins in these bacteria are triacylated, with the final fatty acid addition performed by Lnt, an apolipoprotein n-acyltransferase. The mature lipoproteins are then sorted...

  5. Negative Interpersonal Interactions in Student Training Settings

    Science.gov (United States)

    Ferris, Patricia A.; Kline, Theresa J. B.

    2009-01-01

    Studies demonstrate that negative interpersonal interaction(s) (NII) such as bullying are frequent and harmful to individuals in workplace and higher education student settings. Nevertheless, it is unclear whether the degree of perceived severity of NII varies by the status of the actor. The present study explored the moderating effect of actor…

  6. Finite Metric Spaces of Strictly negative Type

    DEFF Research Database (Denmark)

    Hjorth, Poul G.

    If a finite metric space is of strictly negative type then its transfinite diameter is uniquely realized by an infinite extent (“load vector''). Finite metric spaces that have this property include all trees, and all finite subspaces of Euclidean and Hyperbolic spaces. We prove that if the distance...

  7. Entanglement versus negative domains of Wigner functions

    DEFF Research Database (Denmark)

    Dahl, Jens Peder; Mack, H.; Wolf, A.

    2006-01-01

    We show that s waves, that is wave functions that only depend on a hyperradius, are entangled if and only if the corresponding Wigner functions exhibit negative domains. We illustrate this feature using a special class of s waves which allows us to perform the calculations analytically. This class...

  8. Estimating the Probability of Negative Events

    Science.gov (United States)

    Harris, Adam J. L.; Corner, Adam; Hahn, Ulrike

    2009-01-01

    How well we are attuned to the statistics of our environment is a fundamental question in understanding human behaviour. It seems particularly important to be able to provide accurate assessments of the probability with which negative events occur so as to guide rational choice of preventative actions. One question that arises here is whether or…

  9. Shifted Non-negative Matrix Factorization

    DEFF Research Database (Denmark)

    Mørup, Morten; Madsen, Kristoffer Hougaard; Hansen, Lars Kai

    2007-01-01

    Non-negative matrix factorization (NMF) has become a widely used blind source separation technique due to its part based representation and ease of interpretability. We currently extend the NMF model to allow for delays between sources and sensors. This is a natural extension for spectrometry data...

  10. Comprehension of Action Negation Involves Inhibitory Simulation

    Directory of Open Access Journals (Sweden)

    Francesco eForoni

    2013-05-01

    Full Text Available Previous research suggests that action language is comprehended by activating the motor system. We report a study, investigating a critical question in this research field: Do negative sentences activate the motor system? Participants were exposed to sentences in the affirmation and negation forms while the zygomatic muscle activity on the left side of the face was continuously measured (Electromyography technique: EMG. Sentences were descriptions of emotional expressions that mapped either directly upon the zygomatic muscle (e.g., ‘I am smiling’ or did not (e.g., ‘I am frowning’. Reading sentences involving the negation of the activity of a specific muscle (zygomatic major - I am not smiling is shown to lead to the inhibition of this muscle. Reading sentences involving the affirmative form instead (I am smiling leads to the activation of zygomatic mucle. In contrast, sentences describing an activity that is irrelevant to the zygomatic muscle (e.g., ‘I am frowning’ or ‘I am not frowning’ produce no muscle activity. These results extend the range of simulation models to negation and by implication to an abstract domain. We discuss how this research contributes to the grounding of abstract and concrete concepts.

  11. The negative brain scintiscan in brain tumours

    International Nuclear Information System (INIS)

    Dalke, K.G.

    1978-01-01

    On the basis of 53 histologically verified and two histologically unidentified brain tumours, the author examined the reasons for these wrongly negative scintiscans. EEGs and angiographies carried out at about the same time were taken into account and compared with the scintigraphic findings. (orig.) [de

  12. Negative Life Events Scale for Students (NLESS)

    Science.gov (United States)

    Buri, John R.; Cromett, Cristina E.; Post, Maria C.; Landis, Anna Marie; Alliegro, Marissa C.

    2015-01-01

    Rationale is presented for the derivation of a new measure of stressful life events for use with students [Negative Life Events Scale for Students (NLESS)]. Ten stressful life events questionnaires were reviewed, and the more than 600 items mentioned in these scales were culled based on the following criteria: (a) only long-term and unpleasant…

  13. Autoconditioning system for BNL negative ion sources

    International Nuclear Information System (INIS)

    Larson, R.A.

    1979-01-01

    The autoconditioning system at BNL is being used to condition negative ion sources now under development. A minicomputer with appropriate interface hardware is employed to implement simple algorithims, slowly increasing the operating point of the source. This paper gives a brief description of the hardware and the software system

  14. The Positive Side of Negative Labelling

    NARCIS (Netherlands)

    Dam, van Y.K.; Jonge, de J.

    2015-01-01

    Ethical labels signal positive ethical quality of a product but fail to create massive demand for such products. Based on regulatory focus theory and prospect theory, it is argued that negative signalling of low ethical quality would have a stronger effect on the adoption of ethical products than

  15. An Interpersonal Approach to Writing Negative Messages.

    Science.gov (United States)

    Salerno, Douglas

    1988-01-01

    Asserts that textbook advice regarding buffers and negative messages is simplistic and frequently wrong, and analyses 22 job-refusal letters and their effectiveness. Claims that recent research on cognitive complexity and social perspective-taking suggests the need for more sophisticated audience analysis protocols for dealing with the negative…

  16. Attribution of Negative Intention in Williams Syndrome

    Science.gov (United States)

    Godbee, Kali; Porter, Melanie A.

    2013-01-01

    People with Williams syndrome (WS) are said to have sociable and extremely trusting personalities, approaching strangers without hesitation. This study investigated whether people with WS are less likely than controls to attribute negative intent to others when interpreting a series of ambiguous pictures. This may, at least partially, explain…

  17. Variations of Negative Pressure Wound Therapy

    African Journals Online (AJOL)

    a living reaction which serves to eradicate necrotic tissue and suppress bacterial propagation. In order to gain maximum advantages from NPWT, not only the negative pressure environment, but also the selection of the most suitable dressing material will be necessary. Regarding the treatment of diabetic foot ulcers, there.

  18. Exploring the Psychological Influence of Perceived Negative ...

    African Journals Online (AJOL)

    This paper critically examined the psychological influence of perceived negative foreign factors which were those obstacles brought to Nigeria and Nigerians since our first contact with the European colonialists. The obstacles have constituted formidable barriers to indigenous organisational performance and national ...

  19. Constraints on negative-energy fluxes

    International Nuclear Information System (INIS)

    Ford, L.H.

    1991-01-01

    Locally negative energy due to quantum coherence effects in quantum field theory is discussed. In a previous work, it was argued that a beam carrying negative energy must satisfy an uncertainty-principle-type inequality of the form |ΔE|Δt≤1, where |ΔE| is the magnitude of the negative energy that may be transmitted in a time Δt. This conclusion applied only to two-dimensional spacetime, and was based on an examination of particular classes of quantum states. In the present work, we give more precise formulations of this type of inequality for a free massless scalar field in both two- and four-dimensional flat spacetime. These inequalities are proven to hold for all quantum states. The physical interpretation of these inequalities is also discussed, and it is argued that they are likely to prevent negative energy from producing such large-scale effects as violations of the second law of thermodynamics or of cosmic censorship

  20. THE SISYPHEAN MYTH, NEGATIVE CAPABILITY AND SOCIETAL ...

    African Journals Online (AJOL)

    mycl

    Capability suggest solutions to Camus' Sisyphean problem and its ilk. This paper explores this ... Framed us in jest, and left us now to hazardry? ... and right'; this being one half of a saying meant to create value for a soldier's sacrifice of his ... Keats made an interesting observation and propounded the theory of. 'Negative ...