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Sample records for sputtering oes study

  1. Magnetic study of a few antiferromagnets in very-strong pulsed fields (450 kOE)

    International Nuclear Information System (INIS)

    Krebs, J.

    1968-01-01

    In this thesis we describe a pulsed field device with which we obtain magnetization curves up to 450 kOE at all temperatures between 1. 6 and 300. We have studied the 'spin-flopping'(and therefore the anisotropy) in MnF 2 versus temperature, below the Neel point. We have also studied the antiferromagnets MnSO 4 . and MnSO 4 .H 2 O which have revealed saturation fields respectively of 250 kOE and 320 kOE. (author) [fr

  2. Sputtering of rough surfaces: a 3D simulation study

    Science.gov (United States)

    von Toussaint, U.; Mutzke, A.; Manhard, A.

    2017-12-01

    The lifetime of plasma-facing components is critical for future magnetic confinement fusion power plants. A key process limiting the lifetime of the first-wall is sputtering by energetic ions. To provide a consistent modeling of the sputtering process of realistic geometries, the SDTrimSP-code has been extended to enable the processing of analytic as well as measured arbitrary 3D surface morphologies. The code has been applied to study the effect of varying the impact angle of ions on rough surfaces on the sputter yield as well as the influence of the aspect ratio of surface structures on the 2D distribution of the local sputtering yields. Depending on the surface morphologies reductions of the effective sputter yields to less than 25% have been observed in the simulation results.

  3. Experimental and analytical study of the sputtering phenomena

    International Nuclear Information System (INIS)

    Howard, P.A.

    1976-03-01

    One form of the sputtering phenomena, the heat-transfer process that occurs when an initially hot vertical surface is cooled by a falling liquid film, was examined from a new experimental approach. The sputtering front is the lowest wetted position on the vertical surface and is characterized by a short region of intense nucleate boiling. The sputtering front progresses downward at nearly a constant rate, the surface below the sputtering front being dry and almost adiabatic. This heat-transfer process is of interest in the analysis of some of the performance aspects of emergency core-cooling systems of light-water reactors. An experimental apparatus was constructed to examine the heat-transfer characteristics of a sputtering front. In the present study, a heat source of sufficient intensity was located immediately below the sputtering front, which prevented its downward progress, thus permitting detailed measurements of steady-state surface temperatures throughout a sputtering front. Experimental evidence showed the sputtering front to correspond to a critical heat-flux (CHF) phenomenon. Data were obtained with water flow rates of 350-1600 lb/sub m//hr-ft and subcoolings of 40-140 0 F on a 3 / 8 -in. solid copper rod at 1 atm. A two-dimensional analytical model was developed to describe a stationary sputtering front where the wet-dry interface corresponds to a CHF phenomena and the dry zone is adiabatic. This model is nonlinear because of the temperature dependence of the heat-transfer coefficient in the wetted region and has yielded good agreement with data. A simplified one-dimensional approximation was developed which adequately describes these data. Finally, by means of a coordinate transformation and additional simplifying assumptions, this analysis was extended to analyze moving sputtering fronts, and reasonably good agreement with reported data was shown

  4. Studies on ion scattering and sputtering processes relevant to ion beam sputter deposition of multicomponent thin films

    International Nuclear Information System (INIS)

    Auciello, O.; Ameen, M.S.; Kingon, A.I.

    1989-01-01

    Results from computer simulation and experiments on ion scattering and sputtering processes in ion beam sputter deposition of high Tc superconducting and ferroelectric thin films are presented. It is demonstrated that scattering of neutralized ions from the targets can result in undesirable erosion of, and inert gas incorporation in, the growing films, depending on the ion/target atom ass ratio and ion beam angle of incidence/target/substrate geometry. The studies indicate that sputtering Kr + or Xe + ions is preferable to the most commonly used Ar + ions, since the undesirable phenomena mentioned above are minimized for the first two ions. These results are used to determine optimum sputter deposition geometry and ion beam parameters for growing multicomponent oxide thin films by ion beam sputter-deposition. 10 refs., 5 figs

  5. [Studies on six heavy metal elements dissolution characteristics of Andrographis herb by ICP-OES].

    Science.gov (United States)

    Tang, Rui; Li, Tian-Peng; Gu, Xue-Shi; Li, Yong-Jian; Yang, Yi

    2010-02-01

    A simple and accurate method for the simultaneous determination of As, Ba, Cd, Cr, Cu and Pb in andrographis herb by inductively coupled plasma optical emission spectrometry (ICP-OES) was developed. The samples were digested by HNO3-HClO4. The digestion-determination method was evaluated with the relative standard deviations for all these elements between 2.1% and 4.6%, and the recoveries were between 92.0% and 103.2%. The measuring method was proved to be simple, reliable and highly sensitive. The dissolution characteristics of the 6 heavy metal elements in different solvents and with different extraction methods such as refluxing, soaking, and ultrasonic assisted extraction were studied. The experimental results showed that Ba was in the highest concentration followed by Cu and Cr, and the concentration of As, Pb and Cd was relatively lower in the herb. With the increase in ethanol concentration, the dissolution amount of Ba decreased but that of Cu and Cr increased, and the highest concentration of Cd was dissolved in acidic solution. Overall, Cd and Pb were difficult to dissolve out with 85% ethanol refluxing, but As dissolved comparatively more under the same condition. Comparing the extraction methods, the higher concentration of these 6 metals was obtained by refluxing water or alkaline water than that by 85% ethanol maceration. These differences might be related to the existent forms of these six elements in the herb. The determination and study on dissolution characteristics of these elements by using ICP-OES was important for rational using medicinal resources and ensuring the safety of drugs.

  6. Magnetic study of a few antiferromagnets in very-strong pulsed fields (450 kOE); Etude magnetique de quelques antiferromagnetiques dans des champs pulses tres intenses (450 k OE)

    Energy Technology Data Exchange (ETDEWEB)

    Krebs, J. [Commissariat a l' Energie Atomique, Saclay (France). Centre d' Etudes Nucleaires

    1968-01-01

    In this thesis we describe a pulsed field device with which we obtain magnetization curves up to 450 kOE at all temperatures between 1. 6 and 300. We have studied the 'spin-flopping'(and therefore the anisotropy) in MnF{sub 2} versus temperature, below the Neel point. We have also studied the antiferromagnets MnSO{sub 4}. and MnSO{sub 4}.H{sub 2}O which have revealed saturation fields respectively of 250 kOE and 320 kOE. (author) [French] Ce memoire est consacre a la fabrication et a la mise au point d'un appareillage utilisant la decharge d'une batterie de condensateurs, afin de faire des mesures d'aimantation en champs pulses jusqu'a 450 kOE a toute temperature entre 1,6 K et 300 K. Nous avons etudie le deplacement de la transition de 'spin-flopping' dans MnF{sub 2} en fonction de la temperature et nous en avons deduit la variation de la constante d'anisotropie en fonction de T au-dessous du point de Neel. Nous avons egalement fait l'etude magnetique des antiferromagnetiques MnSO{sub 4} et MnSO{sub 4}.H{sub 2}O et nous avons mis en evidence la saturation de ces deux substances pour des champs respectifs de 250 kOE et 320 kOE. (auteur)

  7. Surfactant assisted chemical vapour generation of silver for AAS and ICP-OES: a mechanistic study

    Czech Academy of Sciences Publication Activity Database

    Matoušek, Tomáš; Sturgeon, R. E.

    2003-01-01

    Roč. 18, č. 5 (2003), s. 487-494 ISSN 0267-9477 Institutional research plan: CEZ:AV0Z4031919 Keywords : vapour generation * ICP-OES * silver Subject RIV: CB - Analytical Chemistry, Separation Impact factor: 3.200, year: 2003

  8. Using ICP-OES and SEM-EDX in biosorption studies.

    Science.gov (United States)

    Michalak, Izabela; Chojnacka, Katarzyna; Marycz, Krzysztof

    2011-02-01

    We have compared the analytical results obtained by inductively coupled plasma optical emission spectroscopy (ICP-OES) and by scanning electron microscopy with an energy dispersive X-ray analytical system (SEM-EDX) in order to explore the mechanism of metal ions biosorption by biomass using two independent methods. The marine macroalga Enteromorpha sp. was enriched with Cu(II), Mn(II), Zn(II), and Co(II) ions via biosorption, and the biosorption capacity of alga determined from the solution and biomass composition before and after biosorption process was compared. The first technique was used to analyze the composition of the natural and metal-loaded biomass, and additionally the composition of the solution before and after biosorption. The second technique was used to obtain a picture of the surface of natural and metal ion-loaded macroalgae, to map the elements on the cell wall of dry biomass, and to determine their concentration before and after biosorption. ICP-OES showed a better precision and lower detection limit than EDX, but SEM-EDX gave more information regarding the sample composition of Enteromorpha sp. Both techniques confirmed that biosorption is a surface phenomenon, in which alkali and alkaline earth metal ions were exchanged by metal ions from aqueous solution.FigureThe advantages and disadvantages of ICP-OES and SEM-EDX techniques ELECTRONIC SUPPLEMENTARY MATERIAL: The online version of this article (doi:10.1007/s00604-010-0468-0) contains supplementary material, which is available to authorized users.

  9. Ion beam analysis of fluoride thin films: study of electronic sputtering

    International Nuclear Information System (INIS)

    Pandey, Avinash C.; Kumar, Manvendra

    2013-01-01

    Electronic sputtering is injection of materials from a solid due to impact of energetic ions in electronic energy loss regime. Electronic sputtering process in nanometric flouride (LiF, CaF 2 and BaF 2 ) thin films has been studied using different ion beam analysis techniques such as Recoil Detection Analysis (ERDA), Rutherford Back Scattering (RBS), and Quadrupole Mass Spectrometer (QMS), Electronic sputter yield, number of sputtered atoms per incidence ion, is deduced from the difference in the thickness/areal concentration in the virgin and sputtered films. A Large Area Position Sensitive Detector Telescope (LAPSDT) was designed and fabricated for online ERD analysis. The sputtering was performed with 120 MeV Ag ions in equilibrium charge state (25+) and at an incidence angle of 20° for online ERD measurements, while part of the film (half part of the films was masked to keep it as virgin film) were irradiated at different fluences for RBS measurements. Effects of various growth parameters (substrate, thickness and/or grain size) and irradiation environment (irradiation temperature, charge state and ion fluence) on electronic sputtering process were observed. On the other hand, the nature of the sputtered particles was studied by QMS. Further, the ion beam induced modifications were characterised by X-ray diffraction and atomic force microscopy. (author)

  10. Effect of Hydrogen on Vacancy Formation in Sputtered Cu Films Studied by Positron Annihilation Spectroscopy

    Science.gov (United States)

    Yabuuchi, Atsushi; Kihara, Teruo; Kubo, Daichi; Mizuno, Masataka; Araki, Hideki; Onishi, Takashi; Shirai, Yasuharu

    2013-04-01

    As a part of the LSI interconnect fabrication process, a post-deposition high-pressure annealing process is proposed for embedding copper into trench structures. The embedding property of sputtered Cu films has been recognized to be improved by adding hydrogen to the sputtering argon gas. In this study, to elucidate the effect of hydrogen on vacancy formation in sputtered Cu films, normal argon-sputtered and argon-hydrogen-sputtered Cu films were evaluated by positron annihilation spectroscopy. As a result, monovacancies with a concentration of more than 10-4 were observed in the argon-hydrogen-sputtered Cu films, whereas only one positron lifetime component corresponding to the grain boundary was detected in the normal argon-sputtered Cu films. This result means monovacancies are stabilized by adding hydrogen to sputtering gas. In the annealing process, the stabilized monovacancies began clustering at around 300 °C, which indicates the dissociation of monovacancy-hydrogen bonds. The introduced monovacancies may promote creep deformation during high-pressure annealing.

  11. Influence of sputtering power on structural and magnetic properties of as-deposited, annealed and ERTA Co2FeSi films: A comparative study

    Science.gov (United States)

    Saravanan, L.; Raja, M. Manivel; Prabhu, D.; Therese, H. A.

    2018-02-01

    We report the effect of sputtering power (200 W - 350 W) on the structural, topographical and magnetic properties of Co2FeSi (CFS) films deposited at ambient temperatures as compared to the films which were either annealed at 300 °C or were subjected to Electron beam Rapid Thermal Annealed (ERTA) treatment. The structural and morphological analyses reveal changes in their crystalline phases and particle sizes. All the as-deposited and annealed CFS films showed A2 phase crystal structure. Whereas the CFS film sputtered at 350 W followed by ERTA displayed the fully ordered L21 structure. The particles are spherical in shape and their sizes increased gradually with increase in the sputtering power of the as-deposited and annealed CFS films. However, ERTA CFS films had spherical as well as columnar (elongated) shaped grains and their grain sizes increased nonlinearly with sputtering power. M-H studies on as-deposited, annealed and ERTA CFS films show ferromagnetic responses. The comparatively stronger ferromagnetic response was observed for the ERTA samples with low saturation field which depends on the enrichment of fine crystallites in these films. This indicates that, apart from higher sputtering powers used for deposition of CFS films, ERTA process plays a significant role in the enhancement of their magnetic responses. 350 W ERTA film has the considerable saturation magnetization (∼816 emu/cc), coercivity (∼527 Oe) and a good squareness values at 100 K than at 300 K, which could originate from the spin wave excitation effect. Further, the optimized parameters to achieve a CFS film with good structural and magnetic properties are discussed from the perspective of spintronics.

  12. Growth and magnetic study of sputtered Fe/Al multilayers

    International Nuclear Information System (INIS)

    Cherif, S.M.; Bouziane, K.; Roussigne, Y.; Al-Busaidy, M.

    2007-01-01

    Brillouin light scattering (BLS) and vibrating sample magnetometry (VSM) were used to study the effect of interfacial intermixing and microstructure on the magnetic properties of DC magnetron sputtered Fe/Al multilayers (MLs) on Si(1 0 0) substrate. Three samples with nominal composition [Al (4 nm)/Fe (3.7 nm)] x18 and deposited under different negative DC bias voltages (V b = -50, -200 and -400 V) have been investigated. The X-ray diffraction results indicate that the FeAl MLs have a poor crystallinity with no evidence of the absence of B2 phase. The grazing X-ray reflectivity results suggest that the interfacial roughness and intermixing were gradually reduced from 0.7 to 0.5 nm (±0.05 nm) by increasing V b from -50 to -400 V. The magnetization measurements demonstrate the presence of in-plane uniaxial anisotropy and magnetically dead interfacial layers. The BLS results reveal spin-wave surface modes whose frequencies also depend on the applied V b . The same trend upon V b was observed for the perpendicular and in-plane anisotropies

  13. Growth and magnetic study of sputtered Fe/Al multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Cherif, S.M. [LPMTM (CNRS-UPR 9001), Universite Paris 13, 99 Av. J.B. Clement, 93430 Villetaneuse (France); Bouziane, K. [LPMTM (CNRS-UPR 9001), Universite Paris 13, 99 Av. J.B. Clement, 93430 Villetaneuse (France) and Department of Physics, College of Science, Sultan Qaboos University, P.O. Box 36, Al-Khodh 123 (Oman)]. E-mail: bouzi@squ.edu.om; Roussigne, Y. [LPMTM (CNRS-UPR 9001), Universite Paris 13, 99 Av. J.B. Clement, 93430 Villetaneuse (France); Al-Busaidy, M. [Department of Physics, College of Science, Sultan Qaboos University, P.O. Box 36, Al-Khodh 123 (Oman)

    2007-03-15

    Brillouin light scattering (BLS) and vibrating sample magnetometry (VSM) were used to study the effect of interfacial intermixing and microstructure on the magnetic properties of DC magnetron sputtered Fe/Al multilayers (MLs) on Si(1 0 0) substrate. Three samples with nominal composition [Al (4 nm)/Fe (3.7 nm)]{sub x18} and deposited under different negative DC bias voltages (V {sub b} = -50, -200 and -400 V) have been investigated. The X-ray diffraction results indicate that the FeAl MLs have a poor crystallinity with no evidence of the absence of B2 phase. The grazing X-ray reflectivity results suggest that the interfacial roughness and intermixing were gradually reduced from 0.7 to 0.5 nm ({+-}0.05 nm) by increasing V {sub b} from -50 to -400 V. The magnetization measurements demonstrate the presence of in-plane uniaxial anisotropy and magnetically dead interfacial layers. The BLS results reveal spin-wave surface modes whose frequencies also depend on the applied V{sub b}. The same trend upon V {sub b} was observed for the perpendicular and in-plane anisotropies.

  14. [Study on allocation rules of common nutrients in Scutellaria baicalensis in different phenological periods by ICP-OES].

    Science.gov (United States)

    Li, Hua; Li, Wei; Zeng, Jie; Yang, Bin

    2012-11-01

    To study the allocation rules of the nutrients in Scutellaria baicalensis in different phenological periods, ICP-OES analytical technique was used to measure the contents of 4 elements (Ca, Mg, P and K) in roots, stems, leaves, flowers and fruids in different phenological periods (such as dormancy period, leaf expansion period, blooming period, fruit maturation period and yellow period) simultaneously. The results indicated that the allocation of Ca, Mg and K in leaves was higher than in the other organs in the vegetative stage, in order to stimulate photosynthesis and generate abundant carbohydrate; there was a larger proportion of P and K in reproductive organ compared with vegetative ones in reproductive stage, and it was beneficial to multiplication, and in yellow period the percentages of Ca, Mg, and K in roots rose slightly to strengthen cold-resistant ability. This study results can help develop scientific and rational fertilization programmes for the cultivation of Scutellaria baicalensis.

  15. Application of ion beam sputtering for diffusion study in solids

    International Nuclear Information System (INIS)

    Shin-ichiro, Fujisawa.

    1989-01-01

    Two techniques involving ion beam sputtering are discussed in relation to their application to diffusion research in cases where the diffusion coefficient is very low. The first of these combines microsectioning by means of ion beam sputtering with a radioactive tracer. Examples given of research using this technique are: self diffusion in single crystals of α-Zr; self diffusion in amorphous metals; temperature and pressure dependence of the self diffusion coefficient in single crystals of Au at low temperatures and in Ge single crystals. The second technique is secondary ion mass spectroscopy (SIMS) depth direction analysis. Recent research using SIMS has included the diffusion of Co impurities in single crystals of Cu and Ge impurity diffusion in Si single crystals. These researches could not have been carried out effectively, or in some cases at all, by means of more conventional techniques. (UK)

  16. Magnetic and magneto-optic study of antiferromagnets in very high fields (500 kOe)

    International Nuclear Information System (INIS)

    Gunzbourg, Jacques de

    1970-01-01

    A description is given of devices which have been developed for pulsed field magnetization measurements between 1.6 deg. K and 300 deg. K and for static and pulsed field Faraday rotation measurements between 6 deg. K. and 300 deg. K throughout the whole visible spectra. A comparative study was made of the magnetic and magneto-optic properties of a metamagnetic substance, NiCl 2 , and a systematic analysis was made of the non-linearity of its magnetization with respect to the field (before saturation); this phenomena is observed with most antiferromagnetic materials. (author) [fr

  17. Study of sintered Nd-Fe-B magnet with high performance of Hcj (kOe + (BHmax (MGOe > 75

    Directory of Open Access Journals (Sweden)

    Bo-Ping Hu

    2013-04-01

    Full Text Available We have developed a Nd-Fe-B sintered magnet of extremely high performance. The intrinsic coercivity Hcj is as high as 35.2 kOe (2803kA/m together with the maximum energy product (BHmax of 40.4 MGOe (321.6kJ/m3. These values result in Hcj (kOe + (BHmax (MGOe > 75. Between 293 K (20ºC and 473 K (200ºC, the temperature coefficients of remanence and intrinsic coercivity are αBr = −0.122 %/°C and αHcj = −0.403%/°C, respectively. A maximum operating temperature of 503 K (230ºC is obtained when permeance coefficient Pc = −B/H = 2. Grain boundary diffusion (GBD technique on magnet surface has been developed to increase Hcj by 3.6 kOe without significantly decrease of Br and (BHmax. The intrinsic coercivity of the GBD treated magnet Hcj(C has a linear relationship with that of the untreated magnet Hcj(B between 200 K and 473 K (in unit of kOe: Hcj(C = 1.03Hcj(B + 2.38. The enhancement of Hcj by GBD treatment has contributions not only from the improvement of microstructure but also from the increase of Ha in the grain surface layer. It is also found that GBD treatment brings no deterioration in corrosion resistance of untreated magnet.

  18. Solar system sputtering

    Science.gov (United States)

    Tombrello, T. A.

    1982-01-01

    The sites and materials involved in solar system sputtering of planetary surfaces are reviewed, together with existing models for the processes of sputtering. Attention is given to the interaction of the solar wind with planetary atmospheres in terms of the role played by the solar wind in affecting the He-4 budget in the Venus atmosphere, and the erosion and differentiation of the Mars atmosphere by solar wind sputtering. The study is extended to the production of isotopic fractionation and anomalies in interplanetary grains by irradiation, and to erosion effects on planetary satellites with frozen volatile surfaces, such as with Io, Europa, and Ganymede. Further measurements are recommended of the molecular form of the ejected material, the yields and energy spectra of the sputtered products, the iosotopic fractionation sputtering causes, and the possibility of electronic sputtering enhancement with materials such as silicates.

  19. GD-OES and XPS coupling: A new way for the chemical profiling of photovoltaic absorbers

    Energy Technology Data Exchange (ETDEWEB)

    Mercier, Dimitri, E-mail: dimitri.mercier@uvsq.fr [Institut Lavoisier de Versailles, 45 av. des Etats-Unis, 78035 Versailles Cedex (France); Bouttemy, Muriel; Vigneron, Jackie [Institut Lavoisier de Versailles, 45 av. des Etats-Unis, 78035 Versailles Cedex (France); Chapon, Patrick [HORIBA Jobin Yvon SAS, F-91165 Longjumeau (France); Etcheberry, Arnaud [Institut Lavoisier de Versailles, 45 av. des Etats-Unis, 78035 Versailles Cedex (France)

    2015-08-30

    Highlights: • The coupling between GD-OES and XPS analysis is a promising way for fine characterization of thin layers. • Crater surface modifications obtained after GD-OES sputtering depend to the plasma gas. • Inversion of the gas flow improves the surface of the crater. • The modified layer is totally eliminated a few seconds after restarting GD-OES sputtering. - Abstract: In this paper, we examine the complementarity of Glow Discharge Optical Emission Spectroscopy (GD-OES) and X Ray Photoelectron Spectroscopy (XPS) for the realization of fine chemical depth profiling of photovoltaic absorbers using Cu(In,Ga)Se{sub 2} (CIGS) materials. The possibility to use sequentially these two techniques is discussed in this paper. We have evaluated the chemical modifications of the crater after GD-OES analyses which depend on the manner of finishing the plasma etching sequence; and we propose different ways to limit or eliminate this effect. For the moment, an intermediate step (wet chemical etching or weak sputtering) is required to obtain a CIGS phase in the crater. Finally, we have demonstrated the possibility to restart the GD-OES analyses of the materials after XPS quantification or GD-OES breaking without modifying the profile shape.

  20. [A real-time determination method with laser measurement for depth profile analysis of GD-OES].

    Science.gov (United States)

    Wan, Zhen-Zhen; Li, Xiao-Jia; Wang, Yong-Qing; Shi, Ning; Sun, Rong-Xia

    2011-09-01

    This paper presents the traditional methods of GD depth analysis method and also its limitations, and the earlier studies of real-time depth measurement technology. A new method of real-time depth determination by laser technology for GD-OES depth analysis is proposed. The real-time depth measurement system is composed of laser displacement sensor and new designed Grimm-type GD source based on laser measurement method, and the system design and technical principles are described in detail. Sputtering depth measurement signal and element spectrum signal can be synchronously collected by this system. The displacement phenomenon of glow discharge source during real-time sputtering depth measurement process is analyzed. The real-time sputtering depth measurement curve of zinc alloy standard sample was tested by two laser displacement sensors measurement system. The actual value of sputtering depth was obtained by adding the depth measurement curve of sputtering surface and the reference plane curve, and the actual depth result is in line with Dektak8-type surface profilometer.

  1. Sputtering of water ice

    DEFF Research Database (Denmark)

    Baragiola, R.A.; Vidal, R.A.; Svendsen, W.

    2003-01-01

    We present results of a range of experiments of sputtering of water ice together with a guide to the literature. We studied how sputtering depends on the projectile energy and fluence, ice growth temperature, irradiation temperature and external electric fields. We observed luminescence from...

  2. Online elemental analysis of process gases with ICP-OES: a case study on waste wood combustion.

    Science.gov (United States)

    Wellinger, Marco; Wochele, Joerg; Biollaz, Serge M A; Ludwig, Christian

    2012-10-01

    A mobile sampling and measurement system for the analysis of gaseous and liquid samples in the field was developed. An inductively coupled plasma optical emission spectrometer (ICP-OES), which is built into a van, was used as detector. The analytical system was calibrated with liquid and/or gaseous standards. It was shown that identical mass flows of either gaseous or liquid standards resulted in identical ICP-OES signal intensities. In a field measurement campaign trace and minor elements in the raw flue gas of a waste wood combustor were monitored. Sampling was performed with a highly transport efficient liquid quench system, which allowed to observe temporal variations in the elemental process gas composition. After a change in feedstock an immediate change of the element concentrations in the flue gas was detected. A comparison of the average element concentrations during the combustion of the two feedstocks showed a high reproducibility for matrix elements that are expected to be present in similar concentrations. On the other hand elements that showed strong differences in their concentration in the feedstock were also represented by a higher concentration in the flue gas. Following the temporal variations of different elements revealed strong correlations between a number of elements, such as chlorine with sodium, potassium and zinc, as well as arsenic with lead, and calcium with strontium. Copyright © 2012 Elsevier Ltd. All rights reserved.

  3. [Study on the determination of 28 inorganic elements in sunflower seeds by ICP-OES/ICP-MS].

    Science.gov (United States)

    Liu, Hong-Wei; Qin, Zong-Hui; Xie, Hua-Lin; Cao, Shu

    2013-01-01

    The present paper describes a simple method for the determination of trace elements in sunflower seeds by using inductively coupled plasma optical emission spectrometry (ICP-OES) and inductively coupled plasma spectrometry (ICP-MS). HNO3 + H2O2 were used to achieve the complete decomposition of the organic matrix in a closed-vessel microwave oven. The contents of 10 trace elements (Al, B, Ca, Fe, K, Mg, Na, Si, P and S) in sunflower seeds were determined by ICP-OES while 18 trace elements (As, Ba, Cd, Co, Cr, Cu, Li, Mn, Mo, Ni, Pb, Rb, Sr, Sn, Sb, Ti, V and Zn) were determined by ICP-MS. The rice reference material (GBW10045) was used as standard reference materials. The results showed a good agreement between measured and certified values for all analytes. The concentrations of necessary micro elements Ca, K, Mg, P and S were higher. This method was simple, sensitive and precise and can perform simultaneous multi-elements determination of sunflower seeds.

  4. High-resolution x-ray scatter and reflectivity study of sputtered IR surfaces

    DEFF Research Database (Denmark)

    Christensen, Finn Erland; Abdali, S.; Hornstrup, Allan

    1993-01-01

    In recent years there has been an increased interest in the possible use of Ir as the reflecting surface in X-ray telescope programs. An X-ray study of such surfaces produced by sputtering of Ir on highly polished Zerodur flats is presented here. The study was performed using Fe K(alpha) 1 (6...... result shows that an Ir coating can be produced with nominal bulk density....

  5. Determination of heavy metal content of processed fruit products from Tehran's market using ICP- OES: A risk assessment study.

    Science.gov (United States)

    Fathabad, Ayub Ebadi; Shariatifar, Nabi; Moazzen, Mojtaba; Nazmara, Shahrokh; Fakhri, Yadolah; Alimohammadi, Mahmood; Azari, Ali; Mousavi Khaneghah, Amin

    2018-04-03

    In this study, the levels of Cd, Hg, Sn, Al, Pb and As of 72 samples (36 samples for fruits juices and 36 samples for fruits canned) of three different brands including of Peach, Orange, Cherry, and Pineapple (18 samples of each fruits) marketed in Tehran, Iran (2015) were evaluated using Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES) technique. Also, Probabilistic risk assessment (non-carcinogenic and carcinogenic risks) was estimated by models include target hazard quotient (THQ) and cancer risk (CR) in the Monte Carlo Simulation (MCS) model. However, all samples were contaminated with the heavy metals investigated, most of them not surpassed established standards. The range of concentration for Al, Sn, As, Cd, Hg, and Pb as average in fruit juices were reported as 340.62 (65.17-1039.2), 72.33 (49.76-119.4), 3.76 (1.137-18.36), 2.12 (0.89-3.44), 0.351 and 40.86 (27.87-66.1) μg/kg, respectively. The level of heavy metals measured in different kinds of fruit juices was ranked as Al > Sn > Pb > As > Cd > Hg, and for fruits canned this rank was Pb > Al > Sn > As > Cd > Hg. The range of concentration for Al, Sn, As, Cd, Hg, and Pb in fruits canned were reported as 361.23 (43.15-1121.2), 101.42 (71.45-141.61), 3.92 (1.279-19.50), 2.78 (1.09-5.56), 0.35 and 690.54 (470.56-910.14) μg/kg, respectively. The lead (Pb) concentration in 97.22% (35 out of 36 samples) of fruit juices samples surpassed Codex limit (0.05 mg/kg) and in all samples of FC was lower than the legal limit of Codex limit (1 mg/kg). All of the samples had Tin (Sn) lower than the legal limit of Codex (fruit juices 100 mg/kg and FC 250 mg/kg). The MCS indicated that the rank order of heavy metals in both adults and children based on THQ was Al > Sn > As > Pb > Cd > Hg. The THQ of Al and Sn in the FJ and FC, for both adults, and children, was considerably higher than 1 value. Also, CR of As in both adults and children

  6. Studi Disorder Lapisan Tipis Amorf Silikon Karbon (A-Sic:H Hasil Deposisi Metode Dc Sputtering

    Directory of Open Access Journals (Sweden)

    Rosari Saleh

    2002-08-01

    Full Text Available Disorder Study of Amorphous Silicon Carbon (a-SiC:H Films Deposited by DC Sputtering Method. Disorder amorphous network of amorphous silicon carbon (a-SiC:H films has been investigated for films prepared by dc sputtering method. The films were deposited using silicon target in argon and methane gas mixtures. The optical absorption coefficients have been performed by UV-VIS (ultra violet-visible reflectance and transmittance spectroscopy. Disorder parameter has been obtained from the optical absorption coefficient α (E using Tauc plot. Increasing methane flow rate has an effect on increasing Tauc gap and decreasing disorder parameter. The amorphous network of the films tends to be more disorder with increasing methane flow rate. The relation of disorder amorphous network with structural and compositional properties will be discussed.

  7. Temperature dependent structural and magnetic study of Co-sputtered Fe-Al thin film

    Science.gov (United States)

    Vyas, Anupam; Brajpuriya, Ranjeet

    2017-05-01

    The authors have deposited co-sputtered Fe-Al thin film on a glass substrate. It is the first ever reporting of Fe and Al co-sputtering in an Argon atmosphere under vacuum conditions. The sample was annealed at 200°C, 300°C, 400°C, so as to allow different phase formation in it. To study the structural and magnetic properties of the samples the GIXRD, XRR and MOKE measurements were done. After annealing at 400°C we observed disordered FeAl formation and which after further converted to more ordered phase which is also confirmed from reflectivity measurements. The magnetic measurement shows the magnetic nature of the sample even after annealing at 400°C/5hr.

  8. [Comparative study on five pretreatment methods for ICP-OES determination of mineral elements in Rosa rugosa].

    Science.gov (United States)

    Zhao, Ning; Yang, Bin; Duan, Yu-Cen; Lei, Ran

    2011-08-01

    Abstract Five different pretreatment methods, including dry ashing and microwave digestion with four acid systems (HNO3 + H2O2, HNO3 + H2O2 + HF, HNO3 + HClO4 and HNO3 + HClO4 + HF), were employed for digestion of the samples of Rosa rugosa. Nine major and trace elements were determined using ICP-OES method. The addition standard recovery rates indicate that, with the system of HNO3 + HClO4, better results can be obtained for most of the determined elements. With this method, except for Fe, the recovery rates are in the range of 95.4%-104.6%. For Fe, higher recovery rate (99%) was obtained with HNO3 + H2O2 + HF system.

  9. ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study

    Directory of Open Access Journals (Sweden)

    Abdalla A. Alnajjar

    2012-01-01

    Full Text Available Al-doped ZnO thin films were deposited from two different targets. Ceramic targets were used in RF magnetron sputtering, whereas pulsed magnetron sputtering was used to grow films from powder targets. ZnO:Al films with different thicknesses were sputtered directly on soda-lime glass substrates. The film thickness was in the 0.04–2.0 μm range. The microstructure, such as the grain size and the texture, of the two differently grown ZnO:Al transparent conductive oxide films of different thickness, was studied using X-ray diffraction θ/2θ scans. The optical properties, such as the transmittance and reflectance, were measured using a UV-Vis-NIR spectrometer. Further, the sheet resistance, resistivity, carrier concentration, and Hall mobility of these ZnO:Al thin films were measured as a function of film thickness. These results obtained from the two different deposition techniques were compared and contrasted.

  10. Magnetostrictive thin films prepared by RF sputtering

    International Nuclear Information System (INIS)

    Carabias, I.; Martinez, A.; Garcia, M.A.; Pina, E.; Gonzalez, J.M.; Hernando, A.; Crespo, P.

    2005-01-01

    Fe 80 B 20 thin films have been prepared by ion beam sputtering magnetron on room temperature. The films were fabricated on different substrates to compare the different magnetic and structural properties. In particular the growth of films on flexible substrates (PDMS, Kapton) has been studied to allow a simple integration of the system in miniaturized magnetostrictive devices. X-ray diffraction patterns indicate that films are mainly amorphous although the presence of some Fe nanoparticles cannot be ruled out. The coercive field of thin films ranges between 15 and 35 Oe, depending on substrate. Magnetostriction measurements indicate the strong dependence of the saturation magnetostriction with the substrate. Samples on flexible substrates exhibit a better performance than samples deposited onto glass substrates

  11. Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods

    Science.gov (United States)

    Lei, Hao; Wang, Meihan; Hoshi, Yoichi; Uchida, Takayuki; Kobayashi, Shinichi; Sawada, Yutaka

    2013-11-01

    Aluminum (III) bis(2-methyl-8-quninolinato)-4-phenylphenolate (BAlq) was respectively bombarded and irradiated by Ar ions, oxygen ions, electron beam and ultraviolet light to confirm damages during the sputter-deposition of transparent conductive oxide (TCO) on organic layer. The degree of damage was evaluated by the photoluminescence (PL) spectra of BAlq. The results confirmed the oxygen ions led to a larger damage and were thought to play the double roles of bombardment to organic layer and reaction with organic layer as well. The comparative studies on PL spectra of BAlq after the deposition of TCO films by various sputtering systems, such as conventional magnetron sputtering (MS), low voltage sputtering (LVS) and kinetic-energy-control-deposition (KECD) system, facing target sputtering (FTS) were performed. Relative to MS, LVS and KECD system, FTS can completely suppress the bombardment of the secondary electrons and oxygen negative ions, and keep a higher deposition rate simultaneously, thus it is a good solution to attain a low-damage sputter-deposition.

  12. [Study on microwave digestion of gypsum for the determination of multielement by ICP-OES and ICP-MS].

    Science.gov (United States)

    Wang, Hui; Song, Qiang; Yang, Rui-ming; Yao, Qiang; Chen, Chang-he

    2010-09-01

    Three acids (HNO3, HNO3/HF and HNO3 /HF+ H3BO3) were used to decompose gypsum with microwave digestion system. The contents of 10 mineral elements (Al, Ca, Mg, Fe, K, Na, S, Ti, Si and Sr) in gypsum were determined by inductively coupled plasma-optical emission spectrometry (ICP-OES) while 6 heavy metals (V, Cr, Mn, Zn, Se and Ce) were determined by inductively coupled plasma-mass spectrometry (ICP-MS). GBW03109a, GBW03110 and FGD-2 were used as gypsum standard reference materials. The results showed that two-step microwave digestion with HNO3/HF at 210 degrees C and then adding H3BO3 for the removal of HF and fluorides completely decomposed the gypsums, while this method achieved good recoveries for all elements in the three gypsum standard reference materials. The recovery was from 88% to 112% and the RSD of tests was below 3%. The method was applied to the elemental analysis for flue gas desulfurization gypsums from three coal-fired power plants.

  13. Studies of PMMA sintering foils with and without coating by magnetron sputtering Pd

    Science.gov (United States)

    Cutroneo, M.; Mackova, A.; Torrisi, L.; Vad, K.; Csik, A.; Ando', L.; Svecova, B.

    2017-09-01

    Polymethylmethacrylate thin foils were prepared by using physical and chemical processes aimed at changing certain properties. The density and the optical properties were changed obtaining clear and opaque foils. DC magnetron sputtering method was used to cover the foils with thin metallic palladium layers. The high optical absorbent foils were obtained producing microstructured PMMA microbeads with and without thin metallic coatings. Rutherford Backscattering Spectroscopy, optical investigation and microscopy were employed to characterize the prepared foils useful in the field study of laser-matter interaction.

  14. Studies of the micromorphology of sputtered TiN thin films by autocorrelation techniques

    Science.gov (United States)

    Smagoń, Kamil; Stach, Sebastian; Ţălu, Ştefan; Arman, Ali; Achour, Amine; Luna, Carlos; Ghobadi, Nader; Mardani, Mohsen; Hafezi, Fatemeh; Ahmadpourian, Azin; Ganji, Mohsen; Grayeli Korpi, Alireza

    2017-12-01

    Autocorrelation techniques are crucial tools for the study of the micromorphology of surfaces: They provide the description of anisotropic properties and the identification of repeated patterns on the surface, facilitating the comparison of samples. In the present investigation, some fundamental concepts of these techniques including the autocorrelation function and autocorrelation length have been reviewed and applied in the study of titanium nitride thin films by atomic force microscopy (AFM). The studied samples were grown on glass substrates by reactive magnetron sputtering at different substrate temperatures (from 25 {}°C to 400 {}°C , and their micromorphology was studied by AFM. The obtained AFM data were analyzed using MountainsMap Premium software obtaining the correlation function, the structure of isotropy and the spatial parameters according to ISO 25178 and EUR 15178N. These studies indicated that the substrate temperature during the deposition process is an important parameter to modify the micromorphology of sputtered TiN thin films and to find optimized surface properties. For instance, the autocorrelation length exhibited a maximum value for the sample prepared at a substrate temperature of 300 {}°C , and the sample obtained at 400 {}°C presented a maximum angle of the direction of the surface structure.

  15. Study on the electrical properties of ITO films deposited by facing target sputter deposition

    International Nuclear Information System (INIS)

    Kim, Youn J; Jin, Su B; Kim, Sung I; Choi, Yoon S; Choi, In S; Han, Jeon G

    2009-01-01

    This study examined the mechanism for the change in the electrical properties (carrier concentration (n) and mobility (μ)) of tin-doped indium oxide (ITO) films deposited by magnetron sputtering in a confined facing magnetic field. The relationship between the carrier concentration and the mobility was significantly different from the results reported for ITO films deposited by other magnetron sputtering processes. The lowest resistivity obtained for ITO films deposited in a confined facing magnetic field at low substrate temperatures (approximately 120 0 C) was 4.26 x 10 -4 Ω cm at a power density of 3 W cm -2 . Crystalline ITO films were obtained at a low power density range from 3 to 5 W cm -2 due to the increase in the substrate temperature from 120 to 162 0 C. This contributed to the increased carrier concentration and decreased electrical resistivity. X-ray photoelectron spectroscopy revealed an increase in the concentration of the Sn 4+ states. This was attributed to the formation of a crystalline ITO film, which effectively enhanced the carrier concentration and reduced the carrier mobility.

  16. Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition

    Directory of Open Access Journals (Sweden)

    Chodun Rafal

    2015-12-01

    Full Text Available Encouraged by recent studies and considering the well-documented problems occurring during AlN synthesis, we have chosen two diagnostic methods which would enable us to fully control the process of synthesis and characterize the synthesized aluminum nitride films. In our experiment we have compared the results coming from OES measurements of plasma and circulating power characteristics of the power supply with basic features of the deposited layers. The dual magnetron system operating in AC mode was used in our studies. Processes of aluminum target sputtering were carried out in an atmosphere of a mixture of argon and nitrogen. The plasma emission spectra were measured with the use of a monochromator device. Analyses were made by comparing the positions and intensities of spectral lines of the plasma components. The results obtained allowed us to characterize the sputtering process under various conditions of gas mixture compositions as well as power distribution more precisely, which is reported in this work. The measured spectra were related to the deposition rate, the structure morphology of the films and chemical composition. Our work proved that the use of plasma OES and circulating power measurements make possible to control the process of sputtering and synthesis of deposited films in situ.

  17. Sputter deposited Terfenol-D thin films for multiferroic applications

    Directory of Open Access Journals (Sweden)

    K. P. Mohanchandra

    2015-09-01

    Full Text Available In this paper, we study the sputter deposition and crystallization process to produce high quality Terfenol-D thin film (100 nm with surface roughness below 1.5 nm. The Terfenol-D thin film was produced using DC magnetron sputtering technique with various sputtering parameters and two different crystallization methods, i.e. substrate heating and post-annealing. Several characterization techniques including WDS, XRD, TEM, AFM, SQUID and MOKE were used to determine the physical and magnetic properties of the Terfenol-D films. TEM studies reveal that the film deposited on the heated substrate has large grains grown along the film thickness producing undesirable surface roughness while the film crystallized by post-annealing method shows uniformly distributed small grains producing a smooth surface. The Terfenol-D film was also deposited onto (011 cut PMN-PT single crystal substrate. With the application of an electric field the film exhibited a 1553 Oe change in coercivity with an estimated saturation magnetostriction of λs = 910 x 10−6.

  18. Growth mode and texture study in vanadium dioxide thin films deposited by magnetron sputtering

    International Nuclear Information System (INIS)

    Wei Xiongbang; Wu Zhiming; Xu Xiangdong; Tao Wang; Tang Jingjing; Li Weizhi; Jiang Yadong

    2008-01-01

    Vanadium dioxide (VO 2 ) films with thicknesses of 80, 440 and 1000 nm were deposited on glass substrates by reactive dc magnetron sputtering. The crystallization, surface morphology and structural features were studied by x-ray diffraction, atomic force microscope and scanning electron microscope. Results revealed that the structural features of VO 2 films strongly depend on the film thickness. The grain size and the crystallization extent increase with the increase in film thickness. The growth of VO 2 was demonstrated to be an obvious 'columnar' growth perpendicular to the surface of the glass substrate. Analyses of square resistance and its temperature dependence demonstrated that the thickness of VO 2 films plays an important role in their electric properties. With increasing film thickness, the square resistance decreases, the temperature coefficient of the square resistance increases and the metal-semiconductor phase transition becomes obvious

  19. Setup for in situ X-ray diffraction studies of thin film growth by magnetron sputtering

    CERN Document Server

    Ellmer, K; Weiss, V; Rossner, H

    2001-01-01

    A novel method is described for the in situ-investigation of nucleation and growth of thin films during magnetron sputtering. Energy dispersive X-ray diffraction with synchrotron light is used for the structural analysis during film growth. An in situ-magnetron sputtering chamber was constructed and installed at a synchrotron radiation beam line with a bending magnet. The white synchrotron light (1-70 keV) passes the sputtering chamber through Kapton windows and hits one of the substrates on a four-fold sample holder. The diffracted beam, observed under a fixed diffraction angle between 3 deg. and 10 deg., is energy analyzed by a high purity Ge-detector. The in situ-EDXRD setup is demonstrated for the growth of tin-doped indium oxide (ITO) films prepared by reactive magnetron sputtering from a metallic target.

  20. [Study on microwave digestion of coal for the determination of multi-element by ICP-OES and ICP-MS].

    Science.gov (United States)

    Wang, Hui; Song, Qiang; Yao, Qiang; Chen, Chang-He; Yu, Fei-Lu

    2012-06-01

    Effects of temperature and four acids (HNO3, HNO3/H2O2, HNO3/HF and HNO3/HF+H3BO3) on the coal decomposition by microwave digestion and the multi-element analysis were studied. SARM20 was used as a coal standard reference material. The contents of 10 mineral elements (Al, Ca, Fe, Mg, K, Na, S, Si, Sr and Ti) in the coal SARM20 were determined by inductively coupled plasma-optical emission spectrometry (ICP-OES). And the contents of 20 heavy metals (Li, Be, Sc, V, Cr, Mn, Co, Ni, Cu, Zn, Ga, As, Se, Zr, Sn, Cs, Ba, Ce, Eu and Pb) were determined by inductively coupled plasma-mass spectrometry (ICP-MS). The results showed that the coal was completely decomposed by microwave digestion with HNO3/HF+ H3BO3 at 210 degrees C. Good recoveries for all elements in the coal SARM20 were obtained by this two-step microwave digestion method. The recoveries of the 10 mineral elements were from 87.5% to 98.8%, and the recoveries of the 20 heavy metals were from 85% to 112.5%. All RSDs of tests were below 3%.

  1. Study of the fundamental plasma parameters by HG ICP-OES with a dual hydride generation system

    Directory of Open Access Journals (Sweden)

    Nereida Carrión

    2011-12-01

    Full Text Available The effect of hydrogen from hydrides generation in a radially-viewed inductively coupled plasma optical emission spectroscopy with a dual hydride-generator system on plasma excitation characteristic was studied. The effects of the acid concentration and reductant solution flow rate on the fundamental parameters were evaluated. Results showed an improvement on the plasma excitation conditions compared to standard nebulization. The excitation temperature, the electron number density and the ionic-to-atomic lines Mg(II/Mg(I ratio increased significantly when the system was operated in the dual mode, even at very low reductant flow. These parameters increased in magnitude when increased reductant flow rate and acid concentration

  2. Laser spectroscopy of sputtered atoms

    International Nuclear Information System (INIS)

    Gruen, D.M.; Pellin, M.J.; Young, C.E.; Calaway, W.F.

    1985-01-01

    The use of laser radiation to study the sputtering process is of relatively recent origin. Much has been learned from this work about the basic physics of the sputtering process itself through measurements of velocity and excited state distributions of sputtered atoms and the effects of adsorbates on substrate sputtering yields. Furthermore, the identification, characterization, and sensitive detection of sputtered atoms by laser spectroscopy has led to the development of in situ diagnostics for impurity fluxes in the plasma edge regions of tokamaks and of ultrasensitive methods (ppB Fe in Si) for surface analysis with ultralow (picocoulomb) ion fluences. The techniques involved in this work, laser fluorescence and multiphoton resonance ionization spectroscopy, will be described and illustrations given of results achieved up to now. 55 refs., 5 figs., 1 tab

  3. Study of quartz crystal microbalance NO2 sensor coated with sputtered indium tin oxide film

    International Nuclear Information System (INIS)

    Georgieva, V; Gadjanova, V; Angelov, Ts; Aleksandrova, M; Acad. Georgi Bonchev str.bl. 11, 1113, Sofia (Bulgaria))" data-affiliation=" (Institute of General and Inorganic Chemistry, Bulgarian Academy of Sciences, Acad. Georgi Bonchev str.bl. 11, 1113, Sofia (Bulgaria))" >Stefanov, P; Acad. Georgi Bonchev str.bl. 11, 1113, Sofia (Bulgaria))" data-affiliation=" (Institute of General and Inorganic Chemistry, Bulgarian Academy of Sciences, Acad. Georgi Bonchev str.bl. 11, 1113, Sofia (Bulgaria))" >Dilova, T; Grechnikov, A

    2014-01-01

    A study of NO 2 gas sorption ability of thin indium tin oxide (ITO) deposited on 16 MHz quartz crystal microbalance (QCM) is presented. ITO films are grown by RF sputtering of indium/tin target with weight proportion 95:5 in oxygen environment. The ITO films have been characterized by X-ray photoelectron spectroscopy measurements. The ITO surface composition in atomic % is defined to be: In-40.6%, Sn-4.3% and O-55%. The thickness and refractive index of the films are determined by ellipsometric method. The frequency shift of QCM-ITO is measured at different NO 2 concentrations. The QCM-ITO system becomes sensitive at NO 2 concentration ≥ 500 ppm. The sorbed mass for each concentration is calculated according the Sauerbrey equation. The results indicated that the 1.09 ng of the gas is sorbed into 150 nm thick ITO film at 500 ppm NO 2 concentration. When the NO 2 concentration increases 10 times the calculated loaded mass is 5.46 ng. The sorption process of the gas molecules is defined as reversible. The velocity of sorbtion /desorption processes are studied, too. The QCM coated with thin ITO films can be successfully used as gas sensors for detecting NO 2 in the air at room temperature

  4. The D OE software trigger

    International Nuclear Information System (INIS)

    Linnemann, J.T.; Michigan State Univ., East Lansing, MI

    1992-10-01

    In the D OE experiment, the software filter operates in a processor farm with each node processing a single event. Processing is data-driven: the filter does local processing to verify the candidates from the hardware trigger. The filter code consists of independent pieces called ''tools''; processing for a given hardware bit is a ''script'' invoking one or more ''tools'' sequentially. An offline simulator drives the same code with the same configuration files, running on real or simulated data. Online tests use farm nodes parasiting on the data stream. We discuss the performance of the system and how we attempt to verify its correctness

  5. Wave packet study of the secondary emission of negatively charged, monoatomic ions from sputtered metals

    Energy Technology Data Exchange (ETDEWEB)

    Sindona, A. [Dipartimento di Fisica, Universita della Calabria, Via P. Bucci 31C, 87036 Rende (Italy) and Istituto Nazionale di Fisica Nucleare (INFN), Gruppo collegato di Cosenza, Via P. Bucci 31C, 87036 Rende (Italy)]. E-mail: sindona@fis.unical.it; Riccardi, P. [Dipartimento di Fisica, Universita della Calabria, Via P. Bucci 31C, 87036 Rende (Italy); Istituto Nazionale di Fisica Nucleare (INFN), Gruppo collegato di Cosenza, Via P. Bucci 31C, 87036 Rende (Italy); Maletta, S. [Dipartimento di Fisica, Universita della Calabria, Via P. Bucci 31C, 87036 Rende (Italy); Rudi, S.A. [Dipartimento di Fisica, Universita della Calabria, Via P. Bucci 31C, 87036 Rende (Italy); Istituto Nazionale di Fisica Nucleare (INFN), Gruppo collegato di Cosenza, Via P. Bucci 31C, 87036 Rende (Italy); Falcone, G. [Dipartimento di Fisica, Universita della Calabria, Via P. Bucci 31C, 87036 Rende (Italy); Istituto Nazionale di Fisica Nucleare (INFN), Gruppo collegato di Cosenza, Via P. Bucci 31C, 87036 Rende (Italy)

    2007-05-15

    Secondary emission of Ag{sup -} and Au{sup -} particles, following the sputtering of clean Ag(1 0 0) and Au(1 0 0) targets, respectively, is studied with a Crank-Nicholson wave-packet propagation method. A one-electron pseudo-potential is used to describe the plane metal surface, with a projected band gap, the ejected ion, whose charge state is investigated, and its nearest-neighbor substrate ion, put in motion by the collision cascade generated by the primary ion beam. Time-dependent Schroedinger equation is solved backwards in time to determine the evolution of the affinity orbital of the negative particles from an instant when they are unperturbed, at distances of the order of {approx}10{sup 2} a.u. from the surface, to the instant of ejection. The probability that a band electron will be eventually detected in affinity state of the ejected particle is, thus, calculated and compared with the result of another method based on the spectral decomposition of the one-electron Hamiltonian.

  6. Comparative study of niobium nitride coatings deposited by unbalanced and balanced magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Olaya, J.J. [Departamento de Ingenieria Mecanica y Mecatronica, Universidad Nacional de Colombia, Bogota Colombia (Colombia); Rodil, S.E. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Mexico D. F. 04510 (Mexico); Muhl, S. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Mexico D. F. 04510 (Mexico)], E-mail: muhl@servidor.unam.mx

    2008-10-01

    Niobium nitride (NbN) coatings have many interesting properties such as chemical inertness, excellent mechanical properties, high electrical conductivity, high melting point, and a superconducting transition temperature between 16 and 17 K. For this reason, these compounds have many potential thin film applications. In this work we compare the properties of NbN{sub x} films deposited using well-characterized balanced and unbalanced magnetron sputtering systems. Samples of NbN were deposited in the two systems under almost identical deposition conditions, that is, the same substrate temperature, plasma power, gas pressure, substrate to target distance and Ar/N{sub 2} ratio. Prior to the film preparation both the magnetic field geometry and the characteristics of the plasma were determined. The microstructure and composition of the deposits were analyzed by X-ray diffraction, scanning electron microscopy and X-ray photoelectron spectroscopy. The corrosion resistance and the micro-abrasion wear resistance were measured by anodic polarization potentiodynamic studies and by ball cratering, respectively. The NbN films grown using the highly unbalanced magnetron configuration had a preferential (111) crystal orientation and a composite hardness of up to 2400 HV{sub 0.025}. While the films deposited using the balanced magnetron had a mixed crystalline orientation and a hardness of 2000 HV{sub 0.025}. The results demonstrate the strong effect of magnetic field configuration on the ion bombardment, and the resultant coating characteristics.

  7. Comparative study of niobium nitride coatings deposited by unbalanced and balanced magnetron sputtering

    International Nuclear Information System (INIS)

    Olaya, J.J.; Rodil, S.E.; Muhl, S.

    2008-01-01

    Niobium nitride (NbN) coatings have many interesting properties such as chemical inertness, excellent mechanical properties, high electrical conductivity, high melting point, and a superconducting transition temperature between 16 and 17 K. For this reason, these compounds have many potential thin film applications. In this work we compare the properties of NbN x films deposited using well-characterized balanced and unbalanced magnetron sputtering systems. Samples of NbN were deposited in the two systems under almost identical deposition conditions, that is, the same substrate temperature, plasma power, gas pressure, substrate to target distance and Ar/N 2 ratio. Prior to the film preparation both the magnetic field geometry and the characteristics of the plasma were determined. The microstructure and composition of the deposits were analyzed by X-ray diffraction, scanning electron microscopy and X-ray photoelectron spectroscopy. The corrosion resistance and the micro-abrasion wear resistance were measured by anodic polarization potentiodynamic studies and by ball cratering, respectively. The NbN films grown using the highly unbalanced magnetron configuration had a preferential (111) crystal orientation and a composite hardness of up to 2400 HV 0.025 . While the films deposited using the balanced magnetron had a mixed crystalline orientation and a hardness of 2000 HV 0.025 . The results demonstrate the strong effect of magnetic field configuration on the ion bombardment, and the resultant coating characteristics

  8. Experimental studies of thin films deposition by magnetron sputtering method for CIGS solar cell fabrication

    Science.gov (United States)

    Gułkowski, Sławomir; Krawczak, Ewelina

    2017-10-01

    Among a variety of the thin film solar cell technologies of second generation, copper-indium-gallium-diselenide device (CIGS) with the latest highest lab cell efficiency record of 22.4 % seems to be the most promising for the power generation. This is partly due to the advantages of using low cost films of few microns thick not only as a metallic contacts but also as a main structure of the solar cell consisted of high quality semiconductor layers. This paper reports the experimental studies of the CIGS absorber formation on Soda Lime Glass substrate covered by thin molybdenum film as a back contact layer. All structures were deposited with the use of magnetron sputtering method only. Technological parameters of the deposition process such as deposition power, pressure and deposition time were optimized for each layer of the structure. Mo back contact was examined in terms of resistivity. EDS measurements were carried out to verify stoichiometric composition of CIGS absorber. Thin film of Al was used as a top contact in order to examine the quality of p-n junction. The I-V electrical characteristic of the p-n junction was analysed in terms of solar cell application.

  9. Experimental studies of thin films deposition by magnetron sputtering method for CIGS solar cell fabrication

    Directory of Open Access Journals (Sweden)

    Gułkowski Sławomir

    2017-01-01

    Full Text Available Among a variety of the thin film solar cell technologies of second generation, copper-indium-gallium-diselenide device (CIGS with the latest highest lab cell efficiency record of 22.4 % seems to be the most promising for the power generation. This is partly due to the advantages of using low cost films of few microns thick not only as a metallic contacts but also as a main structure of the solar cell consisted of high quality semiconductor layers. This paper reports the experimental studies of the CIGS absorber formation on Soda Lime Glass substrate covered by thin molybdenum film as a back contact layer. All structures were deposited with the use of magnetron sputtering method only. Technological parameters of the deposition process such as deposition power, pressure and deposition time were optimized for each layer of the structure. Mo back contact was examined in terms of resistivity. EDS measurements were carried out to verify stoichiometric composition of CIGS absorber. Thin film of Al was used as a top contact in order to examine the quality of p-n junction. The I-V electrical characteristic of the p-n junction was analysed in terms of solar cell application.

  10. Crystallization study of amorphous sputtered NiTi bi-layer thin film

    Energy Technology Data Exchange (ETDEWEB)

    Mohri, Maryam, E-mail: mmohri@ut.ac.ir [School of Metallurgy and Materials Engineering, College of Engineering, University of Tehran, Tehran (Iran, Islamic Republic of); Karlsruhe Institute of Technology, Institute of Nanotechnology, 76021 Karlsruhe (Germany); Nili-Ahmadabadi, Mahmoud [School of Metallurgy and Materials Engineering, College of Engineering, University of Tehran, Tehran (Iran, Islamic Republic of); Center of Excellence for High Performance Materials, University of Tehran, Tehran (Iran, Islamic Republic of); Chakravadhanula, Venkata Sai Kiran [Karlsruhe Institute of Technology, Institute of Nanotechnology, 76021 Karlsruhe (Germany)

    2015-05-15

    The crystallization of Ni-rich/NiTiCu bi-layer thin film deposited by magnetron sputtering from two separate alloy targets was investigated. To achieve the shape memory effect, the NiTi thin films deposited at room temperature with amorphous structure were annealed at 773 K for 15, 30, and 60 min for crystallization. Characterization of the films was carried out by differential scanning calorimetry to indicate the crystallization temperature, grazing incidence X-ray diffraction to identify the phase structures, atomic force microscopy to evaluate surface morphology, scanning transmission electron microscopy to study the cross section of the thin films. The results show that the structure of the annealed thin films strongly depends on the temperature and time of the annealing. Crystalline grains nucleated first at the surface and then grew inward to form columnar grains. Furthermore, the crystallization behavior was markedly affected by composition variations. - Highlights: • A developed bi-layer Ni45TiCu5/Ni50.8Ti was deposited on Si substrate and crystallized. • During crystallization, The Ni{sub 45}TiCu{sub 5} layer is thermally less stable than the Ni-rich layer. • The activation energy is 302 and 464 kJ/mol for Cu-rich and Ni-rich layer in bi-layer, respectively.

  11. Study of sputtered ZnO thin films on SiO2 and GaP substrates

    International Nuclear Information System (INIS)

    Brath, T.; Buc, D.; Kovac, J.; Hrnciar, V.; Caplovic, L.

    2011-01-01

    We have investigated n-ZnO polycrystalline thin films prepared on SiO 2 and p-GaP substrate using magnetron sputtering technique. The structural and electrical properties of these structures were studied. The measured parameters give promising results with a possibility to utilize n-ZnO/p-GaP heterostructure for application in the solar cells development especially in the field of nanostructures. The prepared structures will be a subject of further research. (authors)

  12. Electrochemistry of redox-active Mn porphyrin-based SOD mimic MnTnBuOE-2-PyP5+ - Study of Redox Species Involved in ROS/RNS Scavenging

    Directory of Open Access Journals (Sweden)

    Tin Weitner

    2014-09-01

    Full Text Available Manganese ortho tetrakis(N-n-butoxyethylpyridinium-2-ylporphyrin, MnTnBuOE-2-PyP5+, is a third-generation redox-active compound currently undergoing preclinical exploration. This work is intended to complement the already extensive research of its chemical and biological properties by a simple electrochemical study. The thermodynamic parameters related to the Mn(IV porphyrin species of MnTnBuOE-2-PyP5+ determined in this work support its observed reactivity as an efficient scavenger of peroxynitrite. The corresponding driving forces for the possible single-electron or two-electron reductions of ONOO- have been estimated as well.

  13. Experimental study of the discharge in the low pressure plasma jet sputtering system

    Czech Academy of Sciences Publication Activity Database

    Klusoň, J.; Kudrna, P.; Kolpaková, A.; Picková, I.; Hubička, Zdeněk; Tichý, M.

    2013-01-01

    Roč. 53, č. 1 (2013), s. 10-15 ISSN 0863-1042 Institutional support: RVO:68378271 Keywords : hollow cathode * plasma jet sputtering system * Langmuir probe Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 0.983, year: 2013

  14. Comparative study of ITO and TiN fabricated by low-temperature RF biased sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Simon, Daniel K., E-mail: daniel.simon@namlab.com; Schenk, Tony; Dirnstorfer, Ingo; Fengler, Franz P. G.; Jordan, Paul M.; Krause, Andreas [NaMLab gGmbH, Nöthnitzerstr. 64, 01187 Dresden (Germany); Tröger, David [Westsächsische Hochschule Zwickau, Fachgruppe Nanotechnologie, Dr.-Friedrichs-Ring 2a, 08056 Zwickau (Germany); Mikolajick, Thomas [NaMLab gGmbH, Nöthnitzerstr. 64, 01187 Dresden, Germany and TU Dresden, Institut für Halbleiter- und Mikrosystemtechnik (IHM), 01062 Dresden (Germany)

    2016-03-15

    Radio frequency (RF) biasing induced by a second plasma source at the substrate is applied to low-temperature sputtering processes for indium tin oxide (ITO) and titanium nitride (TiN) thin films. Investigations on crystal structure and surface morphology show that RF-biased substrate plasma processes result in a changed growth regime with different grain sizes and orientations than those produced by processes without a substrate bias. The influence of the RF bias is shown comparatively for reactive RF-sputtered ITO and reactive direct-current-sputtered TiN. The ITO layers exhibit an improved electrical resistivity of 0.5 mΩ cm and an optical absorption coefficient of 0.5 × 10{sup 4 }cm{sup −1} without substrate heating. Room-temperature sputtered TiN layers are deposited that possess a resistivity (0.1 mΩ cm) of 3 orders of magnitude lower than, and a density (5.4 g/cm{sup 3}) up to 45% greater than, those obtained from layers grown using the standard process without a substrate plasma.

  15. Study of the sputtered Cu atoms and Cu+ ions in a hollow cathode glow discharge using a hybrid model

    International Nuclear Information System (INIS)

    Baguer, N.; Bogaerts, A.

    2005-01-01

    The role of the Cu atoms sputtered from the cathode material in a cylindrical hollow cathode discharge (HCD) and the corresponding Cu + ions are studied with a self-consistent model based on the principle of Monte Carlo (MC) and fluid simulations. In order to obtain a more realistic view of the discharge processes, this model is coupled with other submodels, which describe the behavior of electrons, fast Ar atoms, Ar + ions, and Ar metastable atoms, also based on the principles of MC and fluid simulations. Typical results are, among others, the thermalization profile of the Cu atoms, the fast Cu atom, the thermal Cu atom and Cu + ion fluxes and densities, and the energy distribution of the Cu + ions. It was found that the contribution of the Ar + ions to the sputtering was the most significant, followed by the fast Ar atoms. At the cathode bottom, there was no net sputtered flux but a net amount of redeposition. Throughout the discharge volume, at all the conditions investigated, the largest concentration of Cu atoms was found in the lower half of the HCD, close to the bottom. Penning ionization was found the main ionization mechanism for the Cu atoms. The ionization degree of copper atoms was found to be in the same order as for the argon atoms (10 -4 )

  16. Low-Energy Sputtering Studies of Boron Nitride with Xenon Ions

    Science.gov (United States)

    Ray, P. K.; Shutthanandan, V.

    1999-01-01

    Sputtering of boron nitride with xenon ions was investigated using secondary ion (SIMS) and secondary neutral (SNMS) mass spectrometry. The ions generated from the ion gun were incident on the target at an angle of 50' with respect to the surface'normal. The energy of ions ranged from 100 eV to 3 keV. A flood electron gun was used to neutralize the positive charge build-up on the target surface. The intensities of sputtered neutral and charged particles, including single atoms, molecules, and clusters, were measured as a function of ion energy. Positive SIMS spectra were dominated by the two boron isotopes whereas BN- and B- were the two major constituents of the negative SIMS spectra. Nitrogen could be detected only in the SNMS spectra. The intensity-energy curves of the sputtered particles were similar in shape. The knees in P-SIMS and SNMS intensity-energy curves appear at around I keV which is significantly higher that 100 to 200 eV energy range at which knees appear in the sputtering of medium and heavy elements by ions of argon and xenon. This difference in the position of the sputter yield knee between boron nitride and heavier targets is due to the reduced ion energy differences. The isotopic composition of secondary ions of boron were measured by bombarding boron nitride with xenon ions at energies ranging from 100 eV to 1.5 keV using a quadrupole mass spectrometer. An ion gun was used to generate the ion beam. A flood electron gun was used to neutralize the positive charge buildup on the target surface. The secondary ion flux was found to be enriched in heavy isotopes at lower incident ion energies. The heavy isotope enrichment was observed to decrease with increasing primary ion energy. Beyond 350 eV, light isotopes were sputtered preferentially with the enrichment increasing to an asymptotic value of 1.27 at 1.5 keV. The trend is similar to that of the isotopic enrichment observed earlier when copper was sputtered with xenon ions in the same energy

  17. Moessbauer study of RF-sputtered Fe{sub x}N(x{approx}2) film

    Energy Technology Data Exchange (ETDEWEB)

    Cai Yingwen E-mail: mossbauer@sinr.ac.cn; Li Aiguo; Cao Jianqing; Ni Xinbo; Zhang Guilin; Yu Ganghui; Xu Weixin

    2000-07-01

    Fe{sub x}N (1.6sputtering of pure iron under high purity argon and nitrogen atmosphere. Abundances of Fe, N, O and C are analyzed by proton deep elastic scattering, while X-ray photoelectron spectroscopy (XPS) is used to detect the oxidation of iron. Moessbauer spectroscopy was used to characterize the samples as-sputtered and after annealing at 200 deg. C, 250 deg. C and 300 deg. C for 30 minutes, respectively. X-ray diffraction and Moessbauer results show that for the chemical ratio of iron in Fe{sub x}N approaching 2, orthorhombic {zeta}-Fe{sub 2}N will transform into hcp {epsilon}-Fe{sub x}N or quasi-ZnS type structure with an increase of nitrogen content in the sputtering atmosphere or after annealing. The first neighbor shell of iron is either rich or depleted of nitrogen in {epsilon}-Fe{sub 2}N.

  18. Determination of trace elements in mine soil samples using portable X-ray fluorescence spectrometer: A comparative study with ICP-OES

    Directory of Open Access Journals (Sweden)

    Hamdi Sahraoui

    2016-08-01

    Full Text Available Lead (Pb, Zinc (Zn and Cadmium (Cd levels on soils surrounding of Lakhouat mine (North-West of Tunisia were measured. The total concentration of these elements in the soil samples was determined by portable X-ray fluorescence (XRF in situ and compared to the traditional digestion method using inductively coupled-plasma optical emission spectroscopy (ICP-OES. Statistical analyses were performed to determine if significant differences existed between the instrumental techniques, which included simple correlations by the regression lines and t-test for mean comparison. The statistical analysis demonstrated that no statistically significant differences were observed for the Pb concentrations; however, for the Zn and Cd concentrations, t-test showed significant differences between the inst

  19. Study of some structural properties of hydrogenated amorphous silicon thin films prepared by radiofrequency cathodic sputtering

    International Nuclear Information System (INIS)

    Mellassi, K.; Chafik El Idrissi, M.; Barhdadi, A.

    2001-08-01

    In this work, we have used the grazing X-rays reflectometry technique to characterise hydrogenated amorphous silicon thin films deposited by radio-frequency cathodic sputtering. Relfectometry measurements are taken immediately after films deposition as well as after having naturally oxidised their surfaces during a more or less prolonged stay in the ambient. For the films examined just after deposition, the role of hydrogen appears in the increase of their density. For those analysed after a short stay in the ambient, hydrogen plays a protective role against the oxidation of their surfaces. This role disappears when the stay in the ambient is so long. (author)

  20. RF magnetron sputtering of a hydroxyapatite target: A comparison study on polytetrafluorethylene and titanium substrates

    Science.gov (United States)

    Surmenev, Roman A.; Surmeneva, Maria A.; Grubova, Irina Yu.; Chernozem, Roman V.; Krause, Bärbel; Baumbach, Tilo; Loza, Kateryna; Epple, Matthias

    2017-08-01

    A pure hydroxyapatite (HA) target was used to prepare the biocompatible coating of HA on the surface of a polytetrafluorethylene (PTFE) substrate, which was placed on the same substrate holder with technically pure titanium (Ti) in the single deposition runs by radio-frequency (RF) magnetron sputtering. The XPS, XRD and FTIR analyses of the obtained surfaces showed that for all substrates, instead of the HA coating deposition, the coating of a mixture of calcium carbonate and calcium fluoride was grown. According to SEM investigations, the surface of PTFE was etched, and the surface topography of uncoated Ti was preserved after the depositions. The FTIR results reveal no phosphate bonds; only calcium tracks were observed in the EDX-spectra on the surface of the coated PTFE substrates. Phosphate oxide (V), which originated from the target, could be removed using a vacuum pump system, or no phosphate-containing bonds could be formed on the substrate surface because of the severe substrate bombardment process, which prevented the HA coating deposition. The observed results may be connected with the surface re-sputtering effect of the growing film by high-energy negatively charged ions (most probably oxygen or fluorine), which are accelerated in the cathode dark sheath.

  1. TiOx deposited by magnetron sputtering: a joint modelling and experimental study

    Science.gov (United States)

    Tonneau, R.; Moskovkin, P.; Pflug, A.; Lucas, S.

    2018-05-01

    This paper presents a 3D multiscale simulation approach to model magnetron reactive sputter deposition of TiOx⩽2 at various O2 inlets and its validation against experimental results. The simulation first involves the transport of sputtered material in a vacuum chamber by means of a three-dimensional direct simulation Monte Carlo (DSMC) technique. Second, the film growth at different positions on a 3D substrate is simulated using a kinetic Monte Carlo (kMC) method. When simulating the transport of species in the chamber, wall chemistry reactions are taken into account in order to get the proper content of the reactive species in the volume. Angular and energy distributions of particles are extracted from DSMC and used for film growth modelling by kMC. Along with the simulation, experimental deposition of TiOx coatings on silicon samples placed at different positions on a curved sample holder was performed. The experimental results are in agreement with the simulated ones. For a given coater, the plasma phase hysteresis behaviour, film composition and film morphology are predicted. The used methodology can be applied to any coater and any films. This paves the way to the elaboration of a virtual coater allowing a user to predict composition and morphology of films deposited in silico.

  2. Study of Sb/SnO2 bi-layer films prepared by ion beam sputtering deposition technique

    International Nuclear Information System (INIS)

    Wang, Chun-Min; Huang, Chun-Chieh; Kuo, Jui-Chao; Huang, Jow-Lay

    2014-01-01

    In the present work, bi-layer thin films of Sb/SnO 2 were produced on unheated glass substrates using ion beam sputtering (IBS) technique without post annealing treatment. The thickness of Sb layers was varied from 2 to 10 nm and the Sb layers were deposited on SnO 2 layers having thicknesses of 40 nm to 115 nm. The effect of thickness was studied on the morphological, electrical and optical properties. The Sb/SnO 2 bi-layer resulted in lowering the electrical resistivity as well as reducing the optical transmittance. However, the optical and electrical properties of the bi-layer films were mainly influenced by the thickness of Sb layers due to progressive transfer in structures from aggregate to continuous films. The bi-layer films show the electrical resistivity of 1.4 × 10 −3 Ω cm and an optical transmittance of 26% for Sb film having 10 nm thickness. - Highlights: • Bi-layer Sb/SnO 2 structures were synthesized by ion beam sputtering (IBS) technique. • The 6 nm-thick Sb film is a transition region in this study. • The conductivity of the bi-layer films is increased as Sb thickness increases. • The transmittance of the bi-layer films is decreased as Sb thickness increases

  3. Physical sputtering of metallic systems by charged-particle impact

    Energy Technology Data Exchange (ETDEWEB)

    Lam, N.Q.

    1989-12-01

    The present paper provides a brief overview of our current understanding of physical sputtering by charged-particle impact, with the emphasis on sputtering of metals and alloys under bombardment with particles that produce knock-on collisions. Fundamental aspects of ion-solid interactions, and recent developments in the study of sputtering of elemental targets and preferential sputtering in multicomponent materials are reviewed. We concentrate only on a few specific topics of sputter emission, including the various properties of the sputtered flux and depth of origin, and on connections between sputtering and other radiation-induced and -enhanced phenomena that modify the near-surface composition of the target. The synergistic effects of these diverse processes in changing the composition of the integrated sputtered-atom flux is described in simple physical terms, using selected examples of recent important progress. 325 refs., 27 figs.

  4. Physical sputtering of metallic systems by charged-particle impact

    International Nuclear Information System (INIS)

    Lam, N.Q.

    1989-12-01

    The present paper provides a brief overview of our current understanding of physical sputtering by charged-particle impact, with the emphasis on sputtering of metals and alloys under bombardment with particles that produce knock-on collisions. Fundamental aspects of ion-solid interactions, and recent developments in the study of sputtering of elemental targets and preferential sputtering in multicomponent materials are reviewed. We concentrate only on a few specific topics of sputter emission, including the various properties of the sputtered flux and depth of origin, and on connections between sputtering and other radiation-induced and -enhanced phenomena that modify the near-surface composition of the target. The synergistic effects of these diverse processes in changing the composition of the integrated sputtered-atom flux is described in simple physical terms, using selected examples of recent important progress. 325 refs., 27 figs

  5. Studi Spektroskopi Electron Spin Resonance (Esr Lapisan Tipis Amorf Silikon Karbon (A-Sic:H Hasil Deposisi Metode Dc Sputtering

    Directory of Open Access Journals (Sweden)

    Rosari Saleh

    2002-04-01

    Full Text Available The dangling bond defect density in sputtered amorphous silicon carbon alloys have been studied by electron spin resonance (ESR. The results show that the spin density decreased slightly with increasing methane fl ow rate (CH4. The infl uence of carbon and hydrogen incorporation on g-value revealed that for CH4 fl ow rate up to 8 sccm, the ESR signal is dominated by defects characteristic of a-Si:H fi lms and for CH4 fl ow rate higher than 8 sccm the g-value decreased towards those usually found in a-C:H fi lms. Infrared (IR results suggest that as CH4 fl ow rate increases more carbon and hydrogen is incorporated into the fi lms to form Si-H, Si-C and C-H bonds. A direct relation between the IR results and the defect density and g-value is observed.

  6. Studies on Magnetron Sputtered ZnO-Ag Films: Adhesion Activity of S. aureus

    Science.gov (United States)

    Geetha, S. R.; Dhivya, P.; Raj, P. Deepak; Sridharan, M.; Princy, S. Adline

    Zinc oxide (ZnO) thin films have been deposited onto thoroughly cleaned stainless steel (AISI SS 304) substrates by reactive direct current (dc) magnetron sputtering and the films were doped with silver (Ag). The prepared thin films were analyzed using X-ray diffraction (XRD), field emission-scanning electron microscopy (FE-SEM) to investigate the structural and morphological properties. The thickness values of the films were in the range of 194 to 256nm. XRD results revealed that the films were crystalline with preferred (002) orientation. Grain size values of pure ZnO films were found to be 19.82-23.72nm. On introducing Ag into ZnO film, the micro-structural properties varied. Adhesion test was carried out with Staphylococcus aureus (S. aureus) in order to know the adherence property of the deposited films. Colony formation units (CFU) were counted manually and bacterial adhesion inhibition (BAI) was calculated. We observed a decrease in the CFU on doping Ag in the ZnO films. BAI of the film deposited at - 100 V substrate bias was found to be increased on Ag doping from 69 to 88%.

  7. Studying the Properties of RF-Sputtered Nanocrystalline Tin-Doped Indium Oxide

    Directory of Open Access Journals (Sweden)

    Abd El-Hady B. Kashyout

    2011-01-01

    Full Text Available The ceramic target of Indium tinoxide (ITO (90% In2O3-10%SnO2 has been used to prepare transparent semiconductive thin films on glass substrate by RF magnetron sputtering at room temperature. The properties of the thin films are affected by controlling the deposition parameters, namely, RF power values and deposition times. The structure, morphology, optical and electrical properties of the thin films are investigated using X-ray diffraction (XRD, field emission scanning electron microscope (FESEM, atomic force microscope (AFM, UV-Vis spectrophotometer, and four-point probe measurement. Nanoparticles of 10–20 nm are measured and confirmed using both FESEM and AFM. The main preferred orientations of the prepared thin films are (222 and (400 of the cubic ITO structure. The transparent semiconductive films have high transmittance within the visible range of values 80–90% and resistivity of about 1.62×10−4 Ω⋅cm.

  8. Reactive sputter deposition

    CERN Document Server

    Mahieu, Stijn

    2008-01-01

    In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

  9. Ultra-low-pressure sputtering to improve exchange bias and tune linear ranges in spin valves

    Energy Technology Data Exchange (ETDEWEB)

    Tang, XiaoLi, E-mail: tangtang1227@163.com; Yu, You; Liu, Ru; Su, Hua; Zhang, HuaiWu; Zhong, ZhiYong; Jing, YuLan

    2017-05-01

    A series of CoFe/IrMn exchange bilayers was grown by DC-sputtering at different ultra-low argon pressures ranging from 0.008 to 0.1 Pa. This pressure range was one to two orders lower than the normal sputtering pressure. Results revealed that the exchange bias increased from 140 to 250 Oe in CoFe(10 nm)/IrMn (15 nm) bilayers of fixed thickness because of the improved crystalline structure and morphological uniformity of films. Since ferromagnetic /antiferromagnetic (FM/AF) bilayers are always used in linear magnetic sensors as detection layers, the varying exchange bias can successfully achieve tunable linear range in a crossed pinning spin valve. The linear range could be adjustable from −80 Oe – +80 Oe to −150 Oe – +150 Oe on the basis of giant magnetoresistance responses. Therefore, this method provides a simple method to tune the operating range of magnetic field sensors. - Highlights: • Increasing exchange bias was achieved in bilayer at ultra-low-pressure sputtering. • The low void density and smooth surface were achieved in low pressure. • Varying exchange bias achieved tunable linear range in spin valve.

  10. Studies the alterations of biochemical and mineral contents in bone tissue of mus musculus due to aluminum toxicity and the protective action of desferrioxamine and deferiprone by FTIR, ICP-OES, SEM and XRD techniques.

    Science.gov (United States)

    Sivakumar, S; Khatiwada, Chandra Prasad; Sivasubramanian, J

    2014-05-21

    The present study has attempt to analyze the changes in the biochemical and mineral contents of aluminum intoxicated bone and determine the protective action of desferrioxamine (DFO) and deferiprone (DFP) by using Fourier transform infrared (FTIR) spectroscopy, X-ray diffraction (XRD), inductively coupled plasma optical emission spectroscopy (ICP-OES), and scanning electron microscopy (SEM) techniques for four groups of animals such as control (Group I), aluminum intoxicated (Group II), Al+DFP (Group III) and Al+DFO+DFP (Group IV) treated groups respectively. The FTIR spectra of the aluminum intoxicated bone showed significant alteration in the biochemical constituents. The bands ratio at I1400/I877 significantly decreased from control to aluminum, but enhanced it by Al+DFP to Al+DFO+DFP treated bone tissue for treatments of 16 weeks. This result suggests that DFO and DFP are the carbonate inhibitor, recovered from chronic growth of bone diseases and pathologies. The alteration of proteins profile indicated by Amide I and Amide II, where peak area values decreased from control to aluminum respectively, but enhanced by treated with DFP (p.o.) and DFO+DFP (i.p.) respectively. The XRD analysis showed a decrease in crystallinity due to aluminum toxicity. Further, the Ca, Mg, and P contents of the aluminum exposed bone were less than those of the control group, and enhanced by treatments with DFO and DFP. The concentrations of trace elements were found by ICP-OES. Therefore, present study suggests that due to aluminum toxicity severe loss of bone minerals, decrease in the biochemical constituents and changes in the surface morphology. Copyright © 2014 Elsevier B.V. All rights reserved.

  11. Improving quality of OE spun yarn

    Science.gov (United States)

    Gafurov, J. K.; Vassiliadis, S.; Gofurov, K.

    2017-10-01

    During the formation of OE yarns on high frequency spinning rotors, dynamic shocks occur which lead to variations in the yarn tension. It is well known that by increasing the spinning speed the irregularity of yarn also increases. The variation of the yarn tension reduces the quality of the product (yarn). The aim of this research work is to find method to decrease the yarn irregularity without decreasing the spinning speed. In this paper also the way of improving of the quality of OE spun yarn is discussed. The OE yarn irregularity has been decreased by changing the construction of existed OE rotor’s separator (OERS). The yarn passes through the yarn lead-funnel to the yarn lead-out tube. The variation of the yarn tension results in the change of the yarn friction on the yarn lead-out wall of the funnel. Then concentric protrusion formed at the centre on the surface of the base lead-out funnel lets the yarn contact the separator and it presses a spring disposed in a recess formed in the separator. As a result, the spring is deformed (axially) and allows the reciprocation the yarn lead-out funnel and yarn lead-out tube, whereby the vibration leading to changes in the yarn tension are absorbed.

  12. Fundamentals of surfactant sputtering

    International Nuclear Information System (INIS)

    Hofsaess, Hans; Zhang Kun

    2009-01-01

    We introduce a new sputter technique, utilizing the steady-state coverage of a substrate surface with up to 10 16 cm -2 of foreign atoms simultaneously during sputter erosion by combined ion irradiation and atom deposition. These atoms strongly modify the substrate sputter yield on atomic to macroscopic length scales and therefore act as surfactant atoms (a blend of 'surface active agent'). Depending on the surfactant-substrate combination, the novel technique allows enhanced surface smoothing, generation of novel surface patterns, shaping of surfaces and formation of ultra-thin films. Sputter yield attenuation is demonstrated for sputtering of Si and Fe substrates and different surfactant species using 5 keV Xe ions at different incidence angles and fluences up to 10 17 cm -2 . Analytical approaches and Monte Carlo simulations are used to predict the sputtering yield attenuation as function of surfactant coverage. For sputtering of Si with Au surfactants we observe high sputter yields despite a steady-state surfactant coverage, which can be explained by strong ion-induced interdiffusion of substrate and surfactant atoms and the formation of a buried Au x Si surfactant layer in dynamic equilibrium.

  13. Sputtering of the 1020 AISI steel in abnormal glow discharge

    Science.gov (United States)

    García Zúñiga, J. A.; Sarmiento Santos, A.; Álvarez Luna, B.

    2017-12-01

    In all material treated in Sbnormal Glow Discharge (AGD) the phenomenon of sputtering occurs. In this work we study the sputtering suffered at different temperatures by AISI 1020 steel subjected to a DC discharge in two types of atmospheres. The steel samples were previously sanded until obtaining mirror brightness and subjected to the AGD plasma in the gaseous atmospheres of H2 and Ar. The temperature for each sputtering process was set in the range of 420°C to 600°C. In these samples the mass variation was measured and the yield sputtering processes was determined. Next, the simulation of the sputtering process was performed in the SRIM/TRIM 2008 software, by adjusting sputtering yield computational computations to those experimentally measured, in order to determine the energy with which the responsible ions of the sputtering collide with studied target.

  14. Study of the chemical sputtering in Tore-Supra; Etude de l'erosion chimique dans le tokamak Tore-Supra

    Energy Technology Data Exchange (ETDEWEB)

    Cambe, A

    2002-06-28

    The work presented in this thesis focuses on the interactions between energetic particles coming from thermonuclear plasma and the inner components of a fusion machine. This interaction induces two major problems: erosion of the wall, and tritium retention. This report treats the erosion of carbon based materials. The first part is devoted to chemical sputtering, that appears to be the principal erosion mechanism, compared to physical sputtering and radiation enhanced sublimation that both can be limited. Chemical sputtering has been studied in situ in the tokamak Tore-Supra for ohmic and lower hybrid (LH) heated discharges, by means of mass spectrometry and optical spectroscopy. We have shown that it is necessary to take into account both methane and heavier hydrocarbons (C{sub 2}D{sub x} and C{sub 3}D{sub y}) in the determination of the chemical sputtering yield. It is found that for the ohmic discharges, the sputtering yield of CD{sub 4} (Y{sub CD4}) is highly flux ({phi}) dependent, showing a variation of the form: Y{sub CD4} {proportional_to} {phi}{sup -0.23}. The experimental study also reveals that an increase of the surface temperature induces an augmentation of Y{sub CD4}. The interpretation and the modelling of the experimental results have been performed with a Monte Carlo code (BBQ. In the second part of this work, we have developed and installed an infrared spectroscopy diagnostic in the 0.8-1.6, {mu}m wavelength range dedicated to the measurement of surface temperature, and the identification of atomic and molecular lines emitted during plasma/wall interactions. In the third part, we present the feasibility study of an in situ tungsten deposition process at low temperature(<80 deg C) in order to suppress the chemical sputtering. This study shows that, with this method call Plasma Assisted Chemical Vapor Deposition (PACVD), we are able to coat the whole inner vessel of a tokamak with 1 {mu}m of tungsten. (author)

  15. Chemical sputtering by impact of excited molecules

    International Nuclear Information System (INIS)

    Krstic, P.S.; Reinhold, C.O.; Stuart, S.J.

    2007-01-01

    We study chemical sputtering of deuterated amorphous carbon surfaces by D atoms, vibrationally excited D 2 , and dissociating D 3 molecules, in a range of impact energies, 7.5 - 30 eV/D. We analyze the role of the internal state, i.e. the vibrationally excited and dissociating states of the neutral molecules resulting from above-surface neutralization of impacting molecular ions in typical sputtering experiments. The sputtering yields are shown to considerably increase with the internal vibrational energy at the lowest impact energies. By comparison of calculated and measured yields we draw conclusions regarding the possible mechanisms for neutralization. (authors)

  16. Multijet production at D OE

    International Nuclear Information System (INIS)

    Womersley, J.

    1996-07-01

    We describe studies of jet production in bar pp collisions at √s = 1.8 TeV. We have investigated topological distributions in inclusive three and four-jet events and find them to be well- described by tree-level QCD matrix elements and also by the HERWIG Monte Carlo. We have measured the ratio of inclusive three-jet to two- jet cross sections as a function of summed jet transverse energy. This is found to be in good qualitative agreement with QCD; the data show some preference for a softer renormalization scale for emission of the third jet

  17. A Study on the Thermodynamics of Grain Growth in R.F. Magnetron Sputtered NiO Thin Films

    Directory of Open Access Journals (Sweden)

    I. Dhanya

    2013-01-01

    Full Text Available Postdeposition annealing of thin nickel films synthesized using R.F. magnetron sputtering technique is carried in this study. The XRD analysis indicates that annealing of the nickel films leads to the formation of nickel oxide with a preferential growth along (200 plane. The oxidation mechanism is observed with a phase transformation and results in polycrystalline NiO films. The surface morphology of the thin films was investigated by scanning electron microscopy (SEM and atomic force microscopy (AFM as a function of annealing temperature. The studies indicate the formation of well-defined grain boundaries due to agglomeration of nanocrystallites. The films annealed in the range 573–773 K are found to be porous. The optical transmission spectra of the films annealed at 773 K exhibit interference effects for photon energies below the fundamental absorption edge. The optical studies indicate the existence of direct interband transition across a bandgap of 3.7 eV in confirmation with earlier band structure calculations.

  18. Alkali metal adsorbate sputtering by molecular impact

    International Nuclear Information System (INIS)

    Moran, J.P.; Wachman, H.Y.; Trilling, L.

    1974-01-01

    An exploratory study of the sputtering by a krypton molecular beam of rubidium adsorbed at low coverage on a tungsten substrate has been described in a previous paper. An extension of this work is reported now

  19. Growth mode and texture development in TiN films during magnetron sputtering - An in situ synchrotron radiation study

    CERN Document Server

    Schell, N; Matz, W; Chevallier, J

    2003-01-01

    For the materials research experimental station of the Rossendorf beamline ROBL at the European Synchrotron Radiation Facility in Grenoble, France, a two magnetron sputter deposition chamber for in situ study of film growth by synchrotron X-ray diffraction and reflectivity was developed. It allows high-quality depositions of compound films and multilayers. Heteroepitaxial layer-by-layer growth of TiN on single crystal MgO(0 0 1) was observed by real-time specular X-ray reflectivity showing characteristic oscillations. The pseudomorphic growth was confirmed by high-resolution TEM micrographs. During growth on amorphous SiO sub 2 on Si(0 0 1) substrates, the microstructural development of TiN films was studied in situ as a function of film thickness. With the deposition parameters chosen, a crossover was observed: grains with a (0 0 2) plane parallel to the film surface dominate at small thicknesses, while, at larger thicknesses, (1 1 1) grains dominate. Recrystallisation was identified as a mechanism that cont...

  20. Electrical and optical study of transparent V-based oxide semiconductors prepared by magnetron sputtering under different conditions

    Directory of Open Access Journals (Sweden)

    E. Prociow

    2011-04-01

    Full Text Available This work is focused on structural, optical and electrical behaviors of vanadium-based oxide thin films prepared by magnetron sputtering under different conditions. Thin films have been deposited on glass substrates from metallic vanadium target at low sputtering pressure. Different working gases: argon/oxygen mixture, and especially pure oxygen gas, have been applied. Results of X-ray diffraction together with optical transmission and temperature- dependent electrical resistivity measurements have been presented. Transmission coefficient, cut-off wavelength and the width of the optical band gap have been calculated from optical measurements. The d.c. resistivity values at room temperature and thermal activation energy have been obtained from electrical investigations. The influence of sputtering process conditions on optical and electrical properties has been discussed.

  1. Study of Fluorine Addition Influence in the Dielectric Constant of Diamond-Like Carbon Thin Film Deposited by Reactive Sputtering

    Science.gov (United States)

    Trippe, S. C.; Mansano, R. D.

    The hydrogenated amorphous carbon films (a-C:H) or DLC (Diamond-Like Carbon) films are well known for exhibiting high electrical resistivity, low dielectric constant, high mechanical hardness, low friction coefficient, low superficial roughness and also for being inert. In this paper, we produced fluorinated DLC films (a-C:F), and studied the effect of adding CF4 on the above-mentioned properties of DLC films. These films were produced by a reactive RF magnetron sputtering system using a target of pure carbon in stable graphite allotrope. We performed measurements of electrical characteristic curves of capacitance as a function of applied tension (C-V) and current as a function of the applied tension (I-V). We showed the dielectric constant (k) and the resistivity (ρ) as functions of the CF4 concentration. On films with 65% CF4, we found that k = 2.7, and on films with 70% CF4, ρ = 12.3 × 1011 Ω cm. The value of the electrical breakdown field to films with 70% CF4 is 5.3 × 106 V/cm.

  2. Proposal to negotiate a collaboration agreement related to the application of novel cavity fabrication techniques and Nb/Cu sputter coating technology in the field of superconducting RF for the Future Circular Collider (FCC) study

    CERN Document Server

    2015-01-01

    Proposal to negotiate a collaboration agreement related to the application of novel cavity fabrication techniques and Nb/Cu sputter coating technology in the field of superconducting RF for the Future Circular Collider (FCC) study

  3. Study of sterilization-treatment in pure and N- doped carbon thin films synthesized by inductively coupled plasma assisted pulsed-DC magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Javid, Amjed [Center for Advanced Plasma Surface Technology (CAPST), NU-SKKU Joint Institute for Plasma Nano-Materials (IPNM), Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Department of Textile Processing, National Textile University, Faisalabad 37610 (Pakistan); Kumar, Manish, E-mail: manishk@skku.edu [Center for Advanced Plasma Surface Technology (CAPST), NU-SKKU Joint Institute for Plasma Nano-Materials (IPNM), Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Han, Jeon Geon, E-mail: hanjg@skku.edu [Center for Advanced Plasma Surface Technology (CAPST), NU-SKKU Joint Institute for Plasma Nano-Materials (IPNM), Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)

    2017-01-15

    Highlights: • Pure and N-doped nanocrystallie carbon films are synthesized by ICP assisted pulsed DC plasma process. • ICP power induces the increase in average graphitic crystallite size from 4.86 nm to 6.42 nm. • Beneficial role of ICP source assistance to achieve high sputtering throughput (deposition rate ∼55 nm/min). • Post-sterilization electron-transport study shows N-doped carbon films having promising stability. - Abstract: Electrically-conductive nanocrystalline carbon films, having non-toxic and non-immunogenic characteristics, are promising candidates for reusable medical devices. Here, the pure and N- doped nanocrystalline carbon films are deposited by the assistance of inductively coupled plasma (ICP) in an unbalanced facing target pulsed-DC magnetron sputtering process. Through the optical emission spectroscopy study, the role of ICP assistance and N-doping on the reactive components/radicals during the synthesis is presented. The N-doping enhances the three fold bonding configurations by increasing the ionization and energies of the plasma species. Whereas, the ICP addition increases the plasma density to control the deposition rate and film structure. As a result, sputtering-throughput (deposition rate: 31–55 nm/min), electrical resistivity (4–72 Ωcm) and water contact angle (45.12°–54°) are significantly tailored. Electric transport study across the surface microchannel confirms the superiority of N-doped carbon films for sterilization stability over the undoped carbon films.

  4. Study of working pressure on the optoelectrical properties of Al–Y codoped ZnO thin-film deposited using DC magnetron sputtering for solar cell applications

    International Nuclear Information System (INIS)

    Hsu, Feng-Hao; Wang, Na-Fu; Tsai, Yu-Zen; Chuang, Ming-Chieh; Cheng, Yu-Song; Houng, Mau-Phon

    2013-01-01

    Low cost transparent conductive Al–Y codoped ZnO (AZOY) thin-films were prepared on a glass substrate using a DC magnetron sputtering technique with various working pressures in the range of 5–13 mTorr. The relationship among the structural, electrical, and optical properties of sputtered AZOY films was studied as a function of working pressure. The XRD measurements show that the crystallinity of the films degraded as the working gas pressure increased. The AZOY thin-film deposited at a working pressure of 5 mTorr exhibited the lowest electrical resistivity of 4.3 × 10 −4 Ω cm, carrier mobility of 30 cm 2 /V s, highest carrier concentration of 4.9 × 10 20 cm −3 , and high transmittance in the visible region (400–800 nm) of approximately 90%. Compared with Al doped ZnO (AZO) thin-films deposited using DC or RF magnetron sputtering methods, a high carrier mobility was observed in our AZOY thin-films. This result can be used to effectively decrease the absorption of near infrared-rays in solar cell applications. The mechanisms are attributed to the larger transition energy between Ar atoms and sputtering particles and the size compensation of the dopants. Finally, the optimal quality AZOY thin-film was used as an emitter layer (or window layer) to form AZOY/n-Si heterojunction solar cells, which exhibited a stable conversion efficiency (η) of 9.4% under an AM1.5 illumination condition.

  5. Study of working pressure on the optoelectrical properties of Al–Y codoped ZnO thin-film deposited using DC magnetron sputtering for solar cell applications

    Energy Technology Data Exchange (ETDEWEB)

    Hsu, Feng-Hao [Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, No. 1, Dasyue Road, East District, Tainan City 701, Taiwan (China); Wang, Na-Fu; Tsai, Yu-Zen; Chuang, Ming-Chieh; Cheng, Yu-Song [Department of Electronic Engineering, Cheng Shiu University, 840 Chengcing Road, Niaosong District, Kaohsiung City 833, Taiwan (China); Houng, Mau-Phon, E-mail: mphoung@eembox.ncku.edu.tw [Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, No. 1, Dasyue Road, East District, Tainan City 701, Taiwan (China)

    2013-09-01

    Low cost transparent conductive Al–Y codoped ZnO (AZOY) thin-films were prepared on a glass substrate using a DC magnetron sputtering technique with various working pressures in the range of 5–13 mTorr. The relationship among the structural, electrical, and optical properties of sputtered AZOY films was studied as a function of working pressure. The XRD measurements show that the crystallinity of the films degraded as the working gas pressure increased. The AZOY thin-film deposited at a working pressure of 5 mTorr exhibited the lowest electrical resistivity of 4.3 × 10{sup −4} Ω cm, carrier mobility of 30 cm{sup 2}/V s, highest carrier concentration of 4.9 × 10{sup 20} cm{sup −3}, and high transmittance in the visible region (400–800 nm) of approximately 90%. Compared with Al doped ZnO (AZO) thin-films deposited using DC or RF magnetron sputtering methods, a high carrier mobility was observed in our AZOY thin-films. This result can be used to effectively decrease the absorption of near infrared-rays in solar cell applications. The mechanisms are attributed to the larger transition energy between Ar atoms and sputtering particles and the size compensation of the dopants. Finally, the optimal quality AZOY thin-film was used as an emitter layer (or window layer) to form AZOY/n-Si heterojunction solar cells, which exhibited a stable conversion efficiency (η) of 9.4% under an AM1.5 illumination condition.

  6. Study on re-sputtering during CN{sub x} film deposition through spectroscopic diagnostics of plasma

    Energy Technology Data Exchange (ETDEWEB)

    Liang, Peipei; Yang, Xu; Li, Hui; Cai, Hua [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Sun, Jian; Xu, Ning [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Shanghai Engineering Research Center of Ultra-Precision Optical Manufacturing, Fudan University, Shanghai 200433 (China); Wu, Jiada, E-mail: jdwu@fudan.edu.cn [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Shanghai Engineering Research Center of Ultra-Precision Optical Manufacturing, Fudan University, Shanghai 200433 (China); Engineering Research Center of Advanced Lighting Technology, Ministry of Education, Fudan University, Shanghai 200433 (China)

    2015-10-15

    A nitrogen-carbon plasma was generated during the deposition of carbon nitride (CN{sub x}) thin films by pulsed laser ablation of a graphite target in a discharge nitrogen plasma, and the optical emission of the generated nitrogen-carbon plasma was measured for the diagnostics of the plasma and the characterization of the process of CN{sub x} film deposition. The nitrogen-carbon plasma was recognized to contain various species including nitrogen molecules and molecular ions excited in the ambient N{sub 2} gas, carbon atoms and atomic ions ablated from the graphite target and CN radicals. The temporal evolution and spatial distribution of the CN emission and their dependence on the substrate bias voltage show two groups of CN radicals flying in opposite directions. One represents the CN radicals formed as the products of the reactions occurring in the nitrogen-carbon plasma, revealing the reactive deposition of CN{sub x} film due to the reactive expansion of the ablation carbon plasma in the discharge nitrogen plasma and the effective formation of gaseous CN radicals as precursors for CN{sub x} film growth. The other one represents the CN radicals re-sputtered from the growing CN{sub x} film by energetic plasma species, evidencing the re-sputtering of the growing film accompanying film growth. And, the re-sputtering presents ion-induced sputtering features.

  7. Comparison between INAA and ICP-OES: analysis of Sudanese medicinal plants

    International Nuclear Information System (INIS)

    Sheikhaldin, Elsadig Abdelmoniem

    2014-07-01

    The aim of this study was to provide elemental concentrations in medicinal plants and mainly to compare the two different determination methods (INAA and ICP-OES after wet digestion) elemental analysis of 14 Sudanese medicinal plants was carried out using INAA and ICP-OES techniques. The selection of reported elements was done according to intersection of elements determined by both techniques. This intersecting element list contained Ca, K, Fe, Mn, Mg, Sr, Zn, Cu, Co, and Cr. INAA correlated well with ICP-OES measurements of the same plants as long as concentrations were sufficiently above LoQ. Correlation coefficients (R 2 ) in this case is close to 1. Generally, INAA results tended to be higher compared to ICP-OES. The performance and possible source of errors of both techniques was discussed also with respect to measurements of certified reference materials. INAA provided the advantage of having both, faster and non destructive sample preparation than ICP-OES. Therefore, INAA may be technique of choice for Ca, K, Zn, and Mg elements specifically when samples are needed for further investigations. Regarding the low concentrations e.g for Cr, Ni or Cu, ICP-OES is the superior technique over INAA due to the sufficiently low limits of determination and thus gaining more detectable results at low concentrations. (author)

  8. Structural and dielectric studies of Co doped MgTiO3 thin films fabricated by RF magnetron sputtering

    Directory of Open Access Journals (Sweden)

    T. Santhosh Kumar

    2014-06-01

    Full Text Available We report the structural, dielectric and leakage current properties of Co doped MgTiO3 thin films deposited on platinized silicon (Pt/TiO2/SiO2/Si substrates by RF magnetron sputtering. The role of oxygen mixing percentage (OMP on the growth, morphology, electrical and dielectric properties of the thin films has been investigated. A preferred orientation of grains along (110 direction has been observed with increasing the OMP. Such evolution of the textured growth is explained on the basis of the orientation factor analysis followed the Lotgering model. (Mg1-xCoxTiO3 (x = 0.05 thin films exhibits a maximum relative dielectric permittivity of ɛr = 12.20 and low loss (tan δ ∼ 1.2 × 10−3 over a wide range of frequencies for 75% OMP. The role of electric field frequency (f and OMP on the ac-conductivity of (Mg0.95Co0.05TiO3 have been studied. A progressive increase in the activation energy (Ea and relative permittivity ɛr values have been noticed up to 75% of OMP, beyond which the properties starts deteriorate. The I-V characteristics reveals that the leakage current density decreases from 9.93 × 10−9 to 1.14 × 10−9 A/cm2 for OMP 0% to 75%, respectively for an electric field strength of 250 kV/cm. Our experimental results reveal up to that OMP ≥ 50% the leakage current mechanism is driven by the ohmic conduction, below which it is dominated by the schottky emission.

  9. Studies on the reactive pulsed-magnetron sputtering of ITO from metallic targets; Untersuchungen zum reaktiven Pulsmagnetronsputtern von ITO von metallischen Targets

    Energy Technology Data Exchange (ETDEWEB)

    Gnehr, W.M.

    2006-06-15

    The thesis deals with a reactive sputter process for the deposition of ITO- films. In contrast to the usual technique, the sputter targets consists of indium-tin-alloy instead of ceramic ITO. All experiments were conducted on an inline coater with 600 mm target-width. The process is stabilized by a control loop based on optical emission detection. The experiments prove, that this control loop guarantees a long term stability of the outcomes of the coating process.Process parameters, that are crucial for the optical and electrical properties of the deposited thin films are identified and studied. Among them are the flow of oxygen and the substrate temperature but also less obvious parameters such as the distance between target and substrate.Througout the work the focus is on the film deposition with pulsed plasmas. Novel bipolar DC pulse- and pulse package generators are employed for the deposition.In order to shed some light onto the influence of certain pulse parameters on the outcome of a particular coating process, a Monte-Carlo-Simulation of the particle flow in pulsed plasmas is developed. This simulation yields the distribution of particles and their respective energies on deliberately placed planes in the process chamber. Particles under investigation are both sputtered species and neutral sputter gas atoms reflected at the target. The results of this simulation provide an explanation for the influence of certain pulse parameters on the outcome of the coating process. The further investigations deal with the influence of the construction of the process chamber on the coating process. For this purpose, locally resolved optical spectra are recorded. In order to analyse these spectra, a novel connected fit algorithm is developed.This algorithm yields the distribution of certain fitparameters on the substrate. Provided the most complex of the discussed parametrizations of the dielectric function are used, these can be crucial properties such as the carrier

  10. SPUTTERED NdFe FILMS WITH PERPENDICULAR ANISOTROPY

    OpenAIRE

    Carey, R.; Crapper, P.; Thomas, B.

    1985-01-01

    Thin films of NdFe with composition in the region of 60 at.% Nd have been prepared by r.f.sputtering on to glass substrates at room temperature and investigated using the polar Kerr effect . All films exhibit relatively square hysteresis loops when the field is reversed along the film normal, many with squareness ratios close to 1.0, and saturation polar Kerr rotations about 0.4°. Some films prepared at very high deposition rates exhibit unusually large coercivities, 1-4kOe, and show a marked...

  11. Study of ion beam sputtered Fe/Si interfaces as a function of Si layer thickness

    Science.gov (United States)

    Kumar, Anil; Brajpuriya, Ranjeet; Singh, Priti

    2018-01-01

    The exchange interaction in metal/semiconductor interfaces is far from being completely understood. Therefore, in this paper, we have investigated the nature of silicon on the Fe interface in the ion beam deposited Fe/Si/Fe trilayers keeping the thickness of the Fe layers fixed at 3 nm and varying the thickness of the silicon sandwich layer from 1.5 nm to 4 nm. Grazing incidence x-ray diffraction and atomic force microscopy techniques were used, respectively, to study the structural and morphological changes in the deposited films as a function of layer thickness. The structural studies show silicide formation at the interfaces during deposition and better crystalline structure of Fe layers at a lower spacer layer thickness. The magnetization behavior was investigated using magneto-optical Kerr effect, which clearly shows that coupling between the ferromagnetic layers is highly influenced by the semiconductor spacer layer thickness. A strong antiferromagnetic coupling was observed for a value of tSi = 2.5 nm but above this value an unexpected behavior of hysteresis loop (step like) with two coercivity values is recorded. For spacer layer thickness greater than 2.5 nm, an elemental amorphous Si layer starts to appear in the spacer layer in addition to the silicide layer at the interfaces. It is observed that in the trilayer structure, Fe layers consist of various stacks, viz., Si doped Fe layers, ferromagnetic silicide layer, and nonmagnetic silicide layer at the interfaces. The two phase hysteresis loop is explained on the basis of magnetization reversal of two ferromagnetic layers, independent of each other, with different coercivities. X-ray photo electron spectroscopy technique was also used to study interfaces characteristics as a function of tSi.

  12. Mössbauer spectroscopy study of surfactant sputtering induced Fe silicide formation on a Si surface

    Energy Technology Data Exchange (ETDEWEB)

    Beckmann, C.; Zhang, K. [2nd Institute of Physics, University of Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen (Germany); Hofsäss, H., E-mail: hans.hofsaess@phys.uni-goettingen.de [2nd Institute of Physics, University of Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen (Germany); Brüsewitz, C.; Vetter, U. [2nd Institute of Physics, University of Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen (Germany); Bharuth-Ram, K. [Physics Department, Durban University of Technology, Durban 4001 (South Africa)

    2015-12-01

    Highlights: • We study the formation of self-organized nanoscale dot and ripple patterns on Si. • Patterns are created by keV noble gas ion irradiation and simultaneous {sup 57}Fe co-deposition. • Ion-induced phase separation and the formation of a-FeSi{sub 2} is identified as relevant process. - Abstract: The formation of Fe silicides in surface ripple patterns, generated by erosion of a Si surface with keV Ar and Xe ions and simultaneous co-deposition of Fe, was investigated with conversion electron Mössbauer spectroscopy, atomic force microscopy and Rutherford backscattering spectrometry. For the dot and ripple patterns studied, we find an average Fe concentration in the irradiated layer between 6 and 25 at.%. The Mössbauer spectra clearly show evidence of the formation of Fe disilicides with Fe content close to 33 at.%, but very little evidence of the formation of metallic Fe particles. The results support the process of ion-induced phase separation toward an amorphous Fe disilicide phase as pattern generation mechanism. The observed amorphous phase is in agreement with thermodynamic calculations of amorphous Fe silicides.

  13. Transmission dynamics of Bartonella sp. strain OE 1-1 in Sundevall's jirds (Meriones crassus).

    Science.gov (United States)

    Morick, Danny; Krasnov, Boris R; Khokhlova, Irina S; Gottlieb, Yuval; Harrus, Shimon

    2013-02-01

    A high prevalence of Bartonella infection is found in many natural systems; however, the transmission dynamics leading to observations of these infections is not fully understood. The capability of Xenopsylla ramesis fleas to serve as competent vectors of Bartonella sp. OE 1-1 (a strain closely related to the zoonotic Bartonella elizabethae) to Meriones crassus jirds was investigated. Naïve X. ramesis fleas were placed for 72 h on naïve jirds or jirds that were either experimentally or naturally infected with Bartonella sp. strain OE 1-1, after which they were placed on naïve jirds. Postfeeding, 69 to 100% of the fleas collected from each Bartonella-positive jird contained Bartonella DNA, and all naïve jirds became positive for Bartonella sp. OE 1-1 after infestation with the infected fleas. In addition, maternal transmission of Bartonella sp. OE 1-1 in jirds was tested by mating 5 Bartonella-positive and 5 naïve female jirds with 10 naïve male jirds in the absence of fleas. Fifteen offspring were delivered by each group. Cultures of blood drawn from all offspring on days 35 and 47 postdelivery were found to be negative for Bartonella. A single spleen sample from the offspring of a Bartonella-positive mother was found molecularly positive for Bartonella sp. OE 1-1. This study demonstrates that X. ramesis fleas are competent vectors of Bartonella sp. OE 1-1 to M. crassus jirds and indicates that maternal transmission is probably not the major transmission route from female jirds to their offspring. We suggest that the dynamics of Bartonella sp. OE 1-1 in the M. crassus jird population in nature is mostly dependent on its vectors.

  14. Contributions of solar-wind induced potential sputtering to the lunar surface erosion rate and it's exosphere

    Science.gov (United States)

    Alnussirat, S. T.; Barghouty, A. F.; Edmunson, J. E.; Sabra, M. S.; Rickman, D. L.

    2018-04-01

    Sputtering of lunar regolith by solar-wind protons and heavy ions with kinetic energies of about 1 keV/amu is an important erosive process that affects the lunar surface and exosphere. It plays an important role in changing the chemical composition and thickness of the surface layer, and in introducing material into the exosphere. Kinetic sputtering is well modeled and understood, but understanding of mechanisms of potential sputtering has lagged behind. In this study we differentiate the contributions of potential sputtering from the standard (kinetic) sputtering in changing the chemical composition and erosion rate of the lunar surface. Also we study the contribution of potential sputtering in developing the lunar exosphere. Our results show that potential sputtering enhances the total characteristic sputtering erosion rate by about 44%, and reduces sputtering time scales by the same amount. Potential sputtering also introduces more material into the lunar exosphere.

  15. FY1995 study to create the high density magnetic recording devices by using an ultra clean sputtering process; 1995 nendo choseijo sputter process ni yoru chokomitsudo jiki kiroku device no sosei

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1997-03-01

    It is important to control microstructure of thin film magnetic devices such as recording heads and media, in order to induce excellent magnetic properties. Since the impurities in the sputtering atmosphere is easily thought to affect strongly on the initial film growth, we will develop the highly purified sputtering atmosphere to establish a fabrication technology of ultra thin metallic films with desirable microstructure. A specialized multi-sputtering system which has extremely clean atmosphere (impurity level: 1/10000 compared to conventional systems) were realized by (a) decreasing out-gassing rate from vacuum chamber, pumping system, cathode, robot, etc. and (b) using ultra-clean processing gas. The base pressure was 8 x 10{sup -12} Torr (XHV) and the build-up rate was less than 1 x 10{sup -8} Torrl/sec. From the correlation between the microstructure and magnetic properties of a part of spin-valve GMR films, the guiding principle for the microstructural design were clarified to induce the exchange coupling effectively at the ferro/antiferromagnetic interface and to enhance the GMR effect at the magnetic/non-magnetic interface. The mechanism of' Cr segregation on the grain boundaries was clarified, in thin film media deposited under ultra clean sputtering process. The material specification of the magnetic ultra thin film media for high density recording with low media noise were designed from view of the thermal agitation. (NEDO)

  16. Proton sputtering. Final report

    International Nuclear Information System (INIS)

    Finfgeld, C.R.

    1975-01-01

    This research provides sputtering yields as a function of energy for H + and D + on several representative pure metallic elements, in the absence of surface contaminants. The experimental technique and apparatus are described. Data are given for Au, Co, Ta, W, and Mo

  17. Lattice dynamics during electronic sputtering of solid Ne

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1997-01-01

    Electronic sputtering of solid neon has been studied with molecular dynamics. The cavity formation around an excited atom and particle migration in the surface region, as well as the sputtering process have been studied. A single atomic exciton has been observed to produce a desorption of up...

  18. Mixed hyperfine interaction in amorphous Fe-Zr sputtered films in external magnetic field - a 57Fe Moessbauer study

    International Nuclear Information System (INIS)

    Fries, S.M.; Crummenauer, J.; Wagner, H.-G.; Gonser, U.; Chien, C.L.

    1986-01-01

    Conventional 57 Fe-Moessbauer spectroscopy provides only information about the magnitude of the splitting QS in the case of electric quadrupole hyperfine interaction, but not on the sign of the main component of the electric field gradient (EFG) or the asymmetry parameter which are sensitive to the local environment of the 57 Fe nuclei. This kind of information is obtained by measurements in external magnetic fields. In the case of amorphous Fe-Zr sputtered films mixed hyperfine interaction leads to a clear change in the behaviour of the Zr-rich and the Fe-rich alloys, indicating the existence of magnetic clusters in the Fe-rich samples. (Auth.)

  19. Effect of surface morphology on the sputtering yields. II. Ion sputtering from rippled surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Makeev, Maxim A. E-mail: makeev@usc.edu; Barabasi, Albert-Laszlo E-mail: alb@nd.edu

    2004-08-01

    Off-normal ion bombardment of solid targets with energetic particles often leads to development of periodically modulated structures on the surfaces of eroded materials. Ion-induced surface roughening, in its turn, causes sputtering yield changes. We report on a comprehensive theoretical study of the effect of rippled surface morphology on the sputtering yields. The yield is computed as a function of the parameters characterizing the surface morphology and the incident ion beam, using the Sigmund's theory of ion sputtering. We find that the surface morphology development may cause substantial variations in the sputter yields, depending on a complex interplay between the parameters characterizing the ripple structure and the incident ion beam. For certain realizations of the ripple structure, the surface morphology is found to induce enhanced, relative to the flat surface value, sputtering yields. On the other hand, there exist regimes in which the sputtering yield is suppressed by the surface roughness below the flat surface result. We confront the obtained theoretical results with available experimental data and find that our model provides an excellent qualitative and, in some cases, quantitative agreement with the results of experimental studies.

  20. Exchange bias in sputtered FeNi/FeMn systems: Effect of short low-temperature heat treatments

    Energy Technology Data Exchange (ETDEWEB)

    Savin, Peter, E-mail: peter.savin@urfu.ru [Department of Magnetism and Magnetic Nanomaterials, Laboratory of Magnetic Sensors, Ural Federal University, 620002 Ekaterinburg (Russian Federation); Guzmán, Jorge [Instituto de Ciencia de Materiales de Madrid-CSIC, 28049 Madrid (Spain); Lepalovskij, Vladimir [Department of Magnetism and Magnetic Nanomaterials, Laboratory of Magnetic Sensors, Ural Federal University, 620002 Ekaterinburg (Russian Federation); Svalov, Andrey; Kurlyandskaya, Galina [Department of Magnetism and Magnetic Nanomaterials, Laboratory of Magnetic Sensors, Ural Federal University, 620002 Ekaterinburg (Russian Federation); Departamento de Electricidad y Electrónica, Universidad del País Vasco (UPV/EHU), 48940 Leioa, Vizcaya (Spain); Asenjo, Agustina [Instituto de Ciencia de Materiales de Madrid-CSIC, 28049 Madrid (Spain); Vas’kovskiy, Vladimir [Department of Magnetism and Magnetic Nanomaterials, Laboratory of Magnetic Sensors, Ural Federal University, 620002 Ekaterinburg (Russian Federation); Vazquez, Manuel [Department of Magnetism and Magnetic Nanomaterials, Laboratory of Magnetic Sensors, Ural Federal University, 620002 Ekaterinburg (Russian Federation); Instituto de Ciencia de Materiales de Madrid-CSIC, 28049 Madrid (Spain)

    2016-03-15

    Short (5 min) post-deposition thermal treatments under magnetic field at low temperature (up to 200 °C) performed in exchange-coupled FeNi(40 nm)/FeMn(20 nm) bilayer thin films prepared by magnetron sputtering are shown to be effective to significantly modify their exchange field (from around 40 Oe down to 27 Oe) between FeNi and FeMn layers. A similar exchange field decrease was observed for the first deposited FeNi layer of the FeNi(40 nm)/FeMn(20 nm)/FeNi(40 nm) trilayer films after the same thermal treatments. The exchange field value for the second FeNi layer was not substantially changed. The X-ray diffraction patterns indicates that such a heat treatment has no effect on the grain size and crystalline texture of the films, while atomic force microscope studies reveal an increase of the surface roughness after the treatment which is more noticeable in the case of the trilayer film. Analysis of the experimental results leads us to conclude that the variations of the exchange field after heat treatment are likely caused by a modification of interfacial roughness and/or interfacial magnetic structure, but unlikely by the changes in the microstructure and/or changes of composition of the antiferromagnetic FeMn layer. - Highlights: • FeNi/FeMn bilayers and FeNi/FeMn/FeNi trilayers were prepared by magnetron sputtering. • Post-deposition heat treatments at the temperatures below 200 °C during 5 min were made. • Annealing reduces the exchange field for the first FeNi layer in trilayers. • The exchange field value for the second FeNi layer was not substantially changed. • Exchange field changes are most likely caused by a modification of interface roughness.

  1. Computer simulation of sputtering: A review

    International Nuclear Information System (INIS)

    Robinson, M.T.; Hou, M.

    1992-08-01

    In 1986, H. H. Andersen reviewed attempts to understand sputtering by computer simulation and identified several areas where further research was needed: potential energy functions for molecular dynamics (MD) modelling; the role of inelastic effects on sputtering, especially near the target surface; the modelling of surface binding in models based on the binary collision approximation (BCA); aspects of cluster emission in MD models; and angular distributions of sputtered particles. To these may be added kinetic energy distributions of sputtered particles and the relationships between MD and BCA models, as well as the development of intermediate models. Many of these topics are discussed. Recent advances in BCA modelling include the explicit evaluation of the time in strict BCA codes and the development of intermediate codes able to simulate certain many-particle problems realistically. Developments in MD modelling include the wide-spread use of many-body potentials in sputtering calculations, inclusion of realistic electron excitation and electron-phonon interactions, and several studies of cluster ion impacts on solid surfaces

  2. Sputtering of Ge(001): transition between dynamic scaling regimes

    DEFF Research Database (Denmark)

    Smilgies, D.-M.; Eng, P.J.; Landemark, E.

    1997-01-01

    We have studied the dynamic behavior of the Ge(001) surface during sputtering in situ and in real time using synchrotron X-ray diffraction. We find two dynamic regimes as a function of surface temperature and sputter current which are separated by a sharp transition. The boundary between these two...

  3. Beam optics optimization of a negative-ion sputter source

    Indian Academy of Sciences (India)

    795–804. Beam optics optimization of a negative-ion sputter source. F OSSWALD£ and R REBMEISTER. Institut de Recherches Subatomiques, UMR 7500 CNRS-IN2P3/ULP, BP 28,. 67037 Strasbourg Cedex 2, France. £Email: francis.osswald@ires.in2p3.fr. Abstract. A negative-ion sputter source has been studied in order ...

  4. Effect of surface morphology on the sputtering yields. I. Ion sputtering from self-affine surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Makeev, Maxim A. E-mail: makeev@usc.edu; Barabasi, Albert-Laszlo E-mail: alb@nd.edu

    2004-08-01

    As extensive experimental studies have shown, under certain conditions, ion bombardment of solid targets induces a random (self-affine) morphology on the ion-eroded surfaces. The rough morphology development is known to cause substantial variations in the sputtering yields. In this article, we present a theoretical model describing the sputter yields from random, self-affine surfaces subject to energetic ion bombardment. We employ the Sigmund's theory of ion sputtering, modified for the case of self-affine surfaces, to compute the sputter yields. We find that the changes in the sputtering yield, associated with the non-planar surface morphology, are strongly dependent on the parameters characterizing the surface roughness (such as the saturation width and the correlation length) and the incident ion beam (such as the incident ion energy and the deposited energy widths). It is shown that, for certain ranges of the parameters variations, surface roughness leads to substantial enhancements in the yield, with magnitude of the effect being more than 100%, as compared to the flat surface value. Furthermore, we find that, depending on the interplay between these parameters, the surface roughness can both enhance and suppress the sputter yields.

  5. Sputtering and mixing of supported nanoparticles

    Energy Technology Data Exchange (ETDEWEB)

    Jiménez-Sáez, J.C., E-mail: jc.jimenez@upm.es [Dept. Física y Química Aplicadas a la Técnica Aeronaútica, ETSIAE, Universidad Politécnica de Madrid (UPM), 28040 Madrid (Spain); Pérez-Martín, A.M.C.; Jiménez-Rodríguez, J.J. [Dept. Física Aplicada III (Electricidad y Electrónica), Facultad de Ciencias Físicas, Universidad Complutense de Madrid (UCM), 28040 Madrid (Spain)

    2013-12-01

    Sputtering and mixing of Co nanoparticles supported in Cu(0 0 1) under 1-keV argon bombardment are studied using molecular-dynamics simulations. Particles of different initial size have been considered. The cluster height decreases exponentially with increasing fluence. In nanoparticles, sputtering yield is significantly enhanced compared to bulk. In fact, the value of this magnitude depends on the cluster height. A theoretical model for sputtering is introduced with acceptable results compared to those obtained by simulation. Discrepancies happen mainly for very small particles. Mixing rate at the interface is quantified; and besides, the influence of border effects for clusters of different initial size is assessed. Mixing rate and border length–surface area ratio for the initial interface show a proportionality relation. The phenomenon of ion-induced burrowing of metallic nanoparticles is analysed.

  6. Combinatorial study of low-refractive Mg-F-Si-O nano-composites deposited by magnetron co-sputtering from compound targets

    Science.gov (United States)

    Mertin, Stefan; Länzlinger, Tony; Sandu, Cosmin S.; Scartezzini, Jean-Louis; Muralt, Paul

    2018-03-01

    Deposition of nano-composite Mg-F-Si-O films on optical grade silica glass was studied employing RF magnetron co-sputtering from magnesium fluoride (MgF2) and fused silica (SiO2) targets. The aim was to obtain a stable and reliable sputtering process for optical coatings exhibiting a refractive index lower than the one of quartz glass (1.46 at 550 nm) without adding gaseous fluorine to the deposition process. The two magnetrons were installed in a confocal way at 45° off-axis with respect to a static substrate, thus creating a lateral gradient in the thin-film composition. The deposited Mg-F-Si-O coatings were structurally analysed by electron dispersive X-ray spectroscopy (EDX), transmission electron microscopy (TEM) and scanning electron microscopy (SEM). The obtained films consist of MgF2 nanocrystals embedded in a SiO2-rich amorphous matrix. Spectroscopic ellipsometry and spectrophotometry measurements showed that they are highly transparent exhibiting a very-low extinction coefficient k and a refractive index n in the desired range between the one of MgF2 (1.38) and SiO2 (1.46). Films with n = 1.424 and 1.435 at 550 nm were accomplished with absorption below the detection threshold.

  7. Structure adhesion and corrosion resistance study of tungsten bisulfide doped with titanium deposited by DC magnetron co-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    De La Roche, J. [Laboratorio de Física del Plasma, Universidad Nacional de Colombia Sede Manizales, Km. 9 vía al aeropuerto, Campus La Nubia, Manizales (Colombia); González, J.M. [Laboratorio de Recubrimientos Duros y Aplicaciones Industriales – RDAI, Universidad del Valle, Calle 13 N° 100-00 Ciudadela Meléndez, Cali (Colombia); Restrepo-Parra, E., E-mail: erestrepop@unal.edu.co [Laboratorio de Física del Plasma, Universidad Nacional de Colombia Sede Manizales, Km. 9 vía al aeropuerto, Campus La Nubia, Manizales (Colombia); Sequeda, F. [Laboratorio de Recubrimientos Duros y Aplicaciones Industriales – RDAI, Universidad del Valle, Calle 13 N° 100-00 Ciudadela Meléndez, Cali (Colombia); Alleh, V.; Scharf, T.W. [The University of North Texas, Department of Materials Science and Engineering, Denton, TX 76203 (United States)

    2014-11-30

    Highlights: • Ti-doped WS{sub 2} films were grown via the magnetron co-sputtering technique. • At a high Ti percentage, the crystalline structure of WS{sub 2} coatings tends to be amorphous. • As the Ti percentage increases in WS{sub 2} coatings, nanocomposites tend to form. • Ti-doped WS{sub 2} films have elastic behavior compared with the plastic response of pure WS{sub 2} films. • A high Ti percentage increases the corrosion resistance of WS{sub 2} films. - Abstract: Titanium-doped tungsten bisulfide thin films (WS{sub 2}-Ti) were grown using a DC magnetron co-sputtering technique on AISI 304 stainless steel and silicon substrates. The films were produced by varying the Ti cathode power from 0 to 25 W. Using energy dispersive spectroscopy (EDS), the concentration of Ti in the WS{sub 2} was determined, and a maximum of 10% was obtained for the sample grown at 25 W. Moreover, the S/W ratio was calculated and determined to increase as a function of the Ti cathode power. According to transmission electron microscopy (TEM) results, at high titanium concentrations (greater than 6%), nanocomposite formation was observed, with nanocrystals of Ti embedded in an amorphous matrix of WS{sub 2}. Using the scratch test, the coatings’ adhesion was analyzed, and it was observed that as the Ti percentage was increased, the critical load (Lc) also increased. Furthermore, the failure type changed from plastic to elastic. Finally, the corrosion resistance was evaluated using the electrochemical impedance spectroscopy (EIS) technique, and it was observed that at high Ti concentrations, the corrosion resistance was improved, as Ti facilitates coating densification and generates a protective layer.

  8. Advanced capabilities and applications of a sputter-RBS system

    International Nuclear Information System (INIS)

    Brijs, B.; Deleu, J.; Beyer, G.; Vandervorst, W.

    1999-01-01

    In previous experiments, sputter-RBS 1 has proven to be an ideal tool to study the interaction of low energy ions. This contribution employs the same methodology to identify surface contamination induced during sputtering and to the determine absolute sputter yields. In the first experiment ERDA analysis was used to study the evolution of Hydrogen contamination during sputter-RBS experiments. Since the determination of Hydrogen concentration in very thin near surface layers is frequently limited by the presence of a strong surface peak of Hydrogen originating from adsorbed contamination of the residual vacuum, removal of this contamination would increase the sensitivity for Hydrogen detection in the near sub surface drastically. Therefore low energy (12 keV) Argon sputtering was used to remove the Hydrogen surface peak. However enhanced Hydrogen adsorption was observed related to the Ar dose. This experiment shows that severe vacuum conditions and the use of high current densities/sputter yields are a prerequisite for an efficient detection of Hydrogen in the near surface layers. In the second experiment, an attempt was made to determine the sputter yield of Cu during low energy (12 keV) Oxygen bombardment. In order to determine the accumulated dose of the low energy ion beam, a separate Faraday cup in combination with a remote controlled current have been added to the existing sputter-RBS set-up. Alternating sputtering and RBS analysis seem to be an adequate tool for the determination of the absolute sputter yield of Cu and this as well in the as under steady state conditions

  9. Impact of Deposition Rate on the Structural and Magnetic Properties of Sputtered Ni/Cu Multilayer Thin Films

    Science.gov (United States)

    Karpuz, Ali; Colmekci, Salih; Kockar, Hakan; Kuru, Hilal; Uckun, Mehmet

    2017-12-01

    The structural and corresponding magnetic properties of Ni/Cu films sputtered at low and high deposition rates were investigated as there is a limited number of related studies in this field. 5[Ni(10 nm)/Cu(30 nm)] multilayer thin films were deposited using two DC sputtering sources at low (0.02 nm/s) and high (0.10 nm/s) deposition rates of Ni layers. A face centered cubic phase was detected for both films. The surface of the film sputtered at the low deposition rate has a lot of micro-grains distributed uniformly and with sizes from 0.1 to 0.4 μm. Also, it has a vertical acicular morphology. At high deposition rate, the number of micro-grains considerably decreased, and some of their sizes increased up to 1 μm. The surface of the Ni/Cu multilayer deposited at the low rate has a relatively more grainy and rugged structure, whereas the surface of the film deposited at the high rate has a relatively larger lateral size of surface grains with a relatively fine morphology. Saturation magnetisation, Ms, values were 90 and 138 emu/cm3 for deposition rates of 0.02 and 0.10 nm/s, respectively. Remanence, Mr, values were also found to be 48 and 71 emu/cm3 for the low and high deposition rates, respectively. The coercivity, Hc, values were 46 and 65 Oe for the low and high Ni deposition rates, respectively. The changes in the film surfaces provoked the changes in the Hc values. The Ms, Mr, and Hc values of the 5[Ni(10 nm)/Cu(30 nm)] films can be adjusted considering the surface morphologies and film contents caused by the different Ni deposition rates.

  10. The level 0 trigger for the D OE detector

    International Nuclear Information System (INIS)

    Bantly, J.; Epstein, K.; Fowler, J.; Gao, G.S.; Hlustick, R.; Lanou, R.E.; Nang, F.; Partridge, R.; Wang, L.; Xu, H.

    1994-01-01

    The D OE detector has completed its first data taking run at the Fermi National Accelerator Laboratory's bar p-p Tevatron collider. The Level 0 trigger system is the D OE experiment's first trigger level used to identify colliding beam crossings containing interactions. It consists of two hodoscopes of scintillation tiles located just outside the D OE central tracking region. The Level 0 trigger provides a fast measurement of the interaction position along the beam axis for use in early trigger decisions. A slower, more accurate position of the interaction and an indication of the occurrence of multiple interactions are available for subsequent trigger decisions. In addition, the Level 0 trigger is used as a luminosity monitor for D OE. Results on the performance of the Level 0 trigger are presented

  11. Quantification of Si in silicone oils by ICP-OES

    DEFF Research Database (Denmark)

    Wang, Qian; Yang, Zhenyu

    2014-01-01

    A new simple and low cost method of quantification of trace amounts of silicon (Si) in silicone oils has been developed by combining the silicone emulsion and inductively coupled plasma optical emission spectroscopy (ICP-OES) analysis. Silicone oils that contained phenyl groups in the viscosity...... range from 20 to 1000 mPa.s formed stable oil in water emulsions in the presence of Tween 80 surfactant and methylisobutylketone (MIBK). The Si in the emulsions was further quantified by ICP-OES. The calibration was performed using spiked inorganic silicon standard in the emulsions and the method...... (LOD) in the emulsion as 0.5 ppm Si. Compared to the Si determination by the direct organic solvent ICP-OES, this method is much more convenient, where a regular ICP-OES instrument can be directly used for the quantification of Si in the silicone oils obtained via extraction by organic solvents from...

  12. Study of the oxidation resistance of ZrxNand ZrxSi1-xN thin films deposited by reactive magnetron sputtering

    International Nuclear Information System (INIS)

    Fernandez, D.R.; Freitas, F.G.R.; Felix, L.C.; Carvalho, R.G.; Fontes Junior, A.S.; Tentardini, E.K.

    2016-01-01

    The objective of this work is to evaluate the oxidation resistance on pure zirconium nitride thin films and with silicon addition (ZrN and ZrSiN respectively). The thin films deposition were performed using reactive magnetron sputtering. The coatings were characterized by Rutherford Backscattering Spectroscopy (RBS), grazing angle X ray diffraction (GAXRD), scanning electronic microscopy (SEM-FEG) and oxidation tests starting from 500°C to 700°C. This study evaluated thin films with silicon content up to 14,9 at.%. GAXRD results showed only ZrN characteristics peaks, which allow the inference that Si3N4 has an amorphous structure. Oxidation tests demonstrate that the film with highest silicon content shows an increase of 200°C in oxidation temperature when compared with ZrN pure thin film. (author)

  13. Depth of origin of atoms sputtered from WyC1-y compounds and the pure elements. A TRIM.SP and TRIDYN simulation study

    International Nuclear Information System (INIS)

    Eckstein, W.; Shulga, V.I.

    2000-01-01

    The depth of origin of sputtered atoms is investigated for tungsten carbide as an example of a compound with two species of large difference in mass. The results are compared with those for the elemental species C and W. This work is an extension of our previous work on elemental targets. The Monte Carlo program TRIM.SP is applied to calculate the distribution of depth of origin and the dependencies of the mean depth of origin on the projectile energy, E, the angle of incidence, α, and target atomic species, for the bombardment with Ar in the energy range 0.1-100 keV. In addition, the change of the depth of origin distributions with bombarding fluence is studied with the dynamic Monte Carlo program TRIDYN

  14. The OE-A OPV demonstrator anno domini 2011

    DEFF Research Database (Denmark)

    Krebs, Frederik C; Fyenbo, Jan; Tanenbaum, David M.

    2011-01-01

    Roll-to-roll manufacture of OPV and integration into credit card sized flashlights for the OE-A demonstrate that large numbers (10 000 units) can be prepared in high technical yield.......Roll-to-roll manufacture of OPV and integration into credit card sized flashlights for the OE-A demonstrate that large numbers (10 000 units) can be prepared in high technical yield....

  15. Fluence-dependent sputtering yield of micro-architectured materials

    Energy Technology Data Exchange (ETDEWEB)

    Matthes, Christopher S.R.; Ghoniem, Nasr M., E-mail: ghoniem@ucla.edu; Li, Gary Z.; Matlock, Taylor S.; Goebel, Dan M.; Dodson, Chris A.; Wirz, Richard E.

    2017-06-15

    Highlights: • Sputtering yield is shown to be transient and heavily dependent on surface architecture. • Fabricated nano- and Microstructures cause geometric re-trapping of sputtered material, which leads to a self-healing mechanism. • Initially, the sputtering yield of micro-architectured Mo is approximately 1/2 the value as that of a planar surface. • The study demonstrates that the sputtering yield is a dynamic property, dependent on the surface structure of a material. • A developed phenomenological model mathematically describes the transient behavior of the sputtering yield as a function of plasma fluence. - Abstract: We present an experimental examination of the relationship between the surface morphology of Mo and its instantaneous sputtering rate as function of low-energy plasma ion fluence. We quantify the dynamic evolution of nano/micro features of surfaces with built-in architecture, and the corresponding variation in the sputtering yield. Ballistic deposition of sputtered atoms as a result of geometric re-trapping is observed, and re-growth of surface layers is confirmed. This provides a self-healing mechanism of micro-architectured surfaces during plasma exposure. A variety of material characterization techniques are used to show that the sputtering yield is not a fundamental property, but that it is quantitatively related to the initial surface architecture and to its subsequent evolution. The sputtering yield of textured molybdenum samples exposed to 300 eV Ar plasma is roughly 1/2 of the corresponding value for flat samples, and increases with ion fluence. Mo samples exhibited a sputtering yield initially as low as 0.22 ± 5%, converging to 0.4 ± 5% at high fluence. The sputtering yield exhibits a transient behavior as function of the integrated ion fluence, reaching a steady-state value that is independent of initial surface conditions. A phenomenological model is proposed to explain the observed transient sputtering phenomenon, and to

  16. Opinions and statements of the experts who studied the framework conditions of abandonment of nuclear power - presented by the commission set in by the OeTV Executive Board (Public Services and Transport Workers' Union)

    International Nuclear Information System (INIS)

    1987-10-01

    The publication consists of two volumes and explains the position and opinions of the OeTV Executive Board concerning abandonment of nuclear power. The first volume presents the Executive Board's statement given in September 1987: Nuclear power should be abandoned, and it can be done; energy policy has to take a new line, concentrating on energy conservation, enhanced use of coal for electricity generation, enhanced use of renewable energy sources; stepwise shutdown of nuclear power stations. The first volume also presents the documents and experience forming the basis of the Union's position, namely the expert opinions on this issue, and an information visit to Sweden together with a report of Sweden's Minister of Industry on effects of the Chernobyl reactor accident. The development of the Union's point of view of energy policy since the year 1976. (HSCH) [de

  17. Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Zhaoying; Liu, Bingwen; Zhao, Evan; Jin, Ke; Du, Yingge; Neeway, James J.; Ryan, Joseph V.; Hu, Dehong; Zhang, Hongliang; Hong, Mina; Le Guernic, Solenne; Thevuthasan, Suntharampillai; Wang, Fuyi; Zhu, Zihua

    2015-08-01

    For the first time, the use of an argon cluster ion sputtering source has been demonstrated to perform superiorly relative to traditional oxygen and cesium ion sputtering sources for ToF-SIMS depth profiling of insulating materials. The superior performance has been attributed to effective alleviation of surface charging. A simulated nuclear waste glass, SON68, and layered hole-perovskite oxide thin films were selected as model systems due to their fundamental and practical significance. Our study shows that if the size of analysis areas is same, the highest sputter rate of argon cluster sputtering can be 2-3 times faster than the highest sputter rates of oxygen or cesium sputtering. More importantly, high quality data and high sputter rates can be achieved simultaneously for argon cluster sputtering while this is not the case for cesium and oxygen sputtering. Therefore, for deep depth profiling of insulating samples, the measurement efficiency of argon cluster sputtering can be about 6-15 times better than traditional cesium and oxygen sputtering. Moreover, for a SrTiO3/SrCrO3 bi-layer thin film on a SrTiO3 substrate, the true 18O/16O isotopic distribution at the interface is better revealed when using the argon cluster sputtering source. Therefore, the implementation of an argon cluster sputtering source can significantly improve the measurement efficiency of insulating materials, and thus can expand the application of ToF-SIMS to the study of glass corrosion, perovskite oxide thin films, and many other potential systems.

  18. Studies of temperature and flux dependences of sputtering yield of nickel from two-layered films of Ni-Ni/sub 3/C

    Energy Technology Data Exchange (ETDEWEB)

    Morita, K.; Ohno, H.; Hayashibara, M.; Itoh, N. (Nagoya Univ. (Japan). Dept. of Crystalline Materials Science)

    1984-03-01

    Rutherford backscattering measurements of ion-induced sputtering of nickel films that are backed by nickel-carbide films on the non-irradiated side have been carried out at various temperature using 5 keV Ar/sup +/ ions of various fluxes. It is found that at elevated temperatures the yields of atomic fluxes sputtered from the composite specimen depend strongly on ion flux. The sputtering of nickel atoms is suppressed substantially by segregated carbon layers for ion fluxes below a certain critical value. As the ion flux is increased the sputtering yield of carbon is found to decrease monotonically, while that of nickel increase abruptly above the critical flux to a maximum value 4 times the elemental yield and then decreases asymptotically to 1/4 of the elemental yield.

  19. Preliminary study of CdTe and CdTe:Cu thin films nanostructures deposited by using DC magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Marwoto, Putut; Made, D. P. Ngurah; Sugianto [Departement of Physics, Faculty of Mathematics and Natural Sciences, Universitas Negeri Semarang, Gunungpati, Semarang 50229 Jawa Tengah (Indonesia); Wibowo, Edy; Astuti, Santi Yuli; Aryani, Nila Prasetya [Materials Research Group, Laboratory of Thin Film, Department of Physics, Universitas Negeri Semarang, Gunungpati, Semarang 50229 Jawa Tengah (Indonesia); Othaman, Zulkafli [Departement of Physics, Universiti Teknologi Malaysia (UTM), Skudai, Johor Bahru (Malaysia)

    2013-09-03

    Growth and properties of CdTe and CdTe:Cu thin films nanostrucures deposited by using dc magnetron sputtering are reported. Scanning electron microscope (SEM) was used to observe the surface morphologies of the thin films. At growth conditions of 250 °C and 14 W, CdTe films did not yet evenly deposited. However, at growth temperature and plasma power of 325 °C and 43 W, both CdTe and CdTe:Cu(2%) have deposited on the substrates. In this condition, the morphology of the films indicate that the films have a grain-like nanostructures. Grain size diameter of about 200 nm begin to appear on top of the films. Energy Dispersive X-rays spectroscopy (EDX) was used to investigate chemical elements of the Cu doped CdTe film deposited. It was found that the film deposited consist of Cd, Te and Cu elements. XRD was used to investigate the full width at half maximum (FWHM) values of the thin films deposited. The results show that CdTe:Cu(2%) thin film has better crystallographic properties than CdTe thin film. The UV-Vis spectrometer was used to investigate the optical properties of thin films deposited. The transmittance spectra showed that transmittance of CdTe:Cu(2%) film is lower than CdTe film. It was found that the bandgap energy of CdTe and CdTe:Cu(2%) thin films of about 1.48 eV.

  20. Improvements in ANIS and inverted sputter sources

    NARCIS (Netherlands)

    Zwol, N.A. van; Vermeer, A.; Strasters, B.A.

    1984-01-01

    In this article two sputter sources, i.e. an ANIS and an inverted sputter source are described. The ANIS has been changed into a SNICS-like configuration and measurements of the output current for different sputter target geometries are presented. In the inverted sputter source an immersion lens was

  1. Determination of trace elements in plant samples using XRF, PIXE and ICP-OES techniques

    International Nuclear Information System (INIS)

    Ahmed, Hassan Elzain Hassan

    2014-07-01

    The purpose of this study is to determine trace element concentration (Ca, Cu, Cr, K,Fe, Mn,Sr, and Za) in some sudanese wild plants namely, Ziziphus Abyssinica and Grewia Tenax. X-ray fluorescence ( X RF), particle-induced x-ray emission ( PIXE) and inductively coupled plasma-optical emission spectroscopy (ICP-OES) techniques were used for element determination. A series of plants standard references materials were used to check the reliability of the different employed techniques as well as to estimate possible factors for correcting the concentration of some elements that deviated significantly from their actual concentration. The results showed that, X RF, PIXE and ICP-OES are equally competitive methods for measuring Ca,K, Fe, Sr and Zn elements. Unlikely to ICP-OES seems to be superior techniques tend to be appropriate methods for Cu determination in plant samples however, for Mn element PIXE and ICP-OES are advisable techniques for measuring this element rather than X RF method. On the other hand, ICP-OES seems to be the superior techniques over PIXE and X RF methods for Cr and Ni determination in plant samples. The effect of geographical location on trace elements concentration in plants has been examined through determination of element in different species of Grewia Tenax than collected from different location. Most of measured elements showed similarity indicating there is no significant impact of locations on the difference of element contents. In addition, two plants with different genetic families namely, Ziziphus Spina Christi and Ziziphus Abyssinica were collected from the same location and screened for their trace element content. It was found that there were no difference between the two plants for Ca, K, Cu, Fe, and Sr element. However, significant variations were observed for Mn and Zn concentrations implying the possibility of using of those two elements for plant taxonomy purposes.(Author)

  2. Sputtering of a silicon surface: Preferential sputtering of surface impurities

    Czech Academy of Sciences Publication Activity Database

    Nietiadi, M.L.; Rosandi, Y.; Lorinčík, Jan; Urbassek, H.M.

    -, č. 303 (2013), s. 205-208 ISSN 0168-583X Institutional support: RVO:67985882 Keywords : Sputtering * Molecular dynamics * SIMS Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 1.186, year: 2013

  3. Sputtering. [as deposition technique in mechanical engineering

    Science.gov (United States)

    Spalvins, T.

    1976-01-01

    This paper primarily reviews the potential of using the sputtering process as a deposition technique; however, the manufacturing and sputter etching aspects are also discussed. Since sputtering is not regulated by classical thermodynamics, new multicomponent materials can be developed in any possible chemical composition. The basic mechanism for dc and rf sputtering is described. Sputter-deposition is described in terms of the unique advantageous features it offers such as versatility, momentum transfer, stoichiometry, sputter-etching, target geometry (coating complex surfaces), precise controls, flexibility, ecology, and sputtering rates. Sputtered film characteristics, such as strong adherence and coherence and film morphology, are briefly evaluated in terms of varying the sputtering parameters. Also described are some of the specific industrial areas which are turning to sputter-deposition techniques.

  4. Improvements in ANIS and inverted sputter sources

    Science.gov (United States)

    Strasters, B. A.; Vermeer, A.; van Zwol, N. A.

    1984-02-01

    In this article two sputter sources, i.e. an ANIS and an inverted sputter source are described. The ANIS has been changed into a SNICS-like configuration and measurements of the output current for different sputter target geometries are presented. In the inverted sputter source an immersion lens was placed between the ionizer and the sputter target. This source is provided with a modified revolving target head with eight targets.

  5. Electrochromism in surface modified crystalline WO3 thin films grown by reactive DC magnetron sputtering

    Science.gov (United States)

    Karuppasamy, A.

    2013-10-01

    In the present work, tungsten oxide thin films were deposited at various oxygen chamber pressures (1.0-5.0 × 10-3 mbar) by maintaining the sputtering power density and argon pressure constant at 3.0 W/cm2 and 1.2 × 10-2 mbar, respectively. The role of surface morphology and porosity on the electrochromic properties of crystalline tungsten oxide thin films has been investigated. XRD and Raman studies reveal that all the samples post annealed at 450 ̊C in air for 3.0 h settle in monoclinic crystal system of tungsten oxide (W18O49). Though the phase of material is indifferent to oxygen pressure variations (PO2), morphology and film density shows a striking dependence on PO2. A systematic study on plasma (OES), morphology, optical and electrochromic properties of crystalline tungsten oxide reveal that the films deposited at PO2 of 2.0 × 10-3 mbar exhibit better coloration efficiency (58 cm2/C), electron/ion capacity (Qc: -25 mC/cm2), and reversibility (92%). This is attributed to the enhanced surface properties like high density of pores and fine particulates (100 nm) and to lesser bulk density of the film (ρ/ρo = 0.84) which facilitates the process of intercalation/de-intercalation of protons and electrons. These results show good promise toward stable and efficient crystalline tungsten oxide based electrochromic device applications.

  6. Ultra High Vacuum Sputtering System

    Science.gov (United States)

    1991-07-25

    NO. NO. Washington, D.C. 20332-6448 E.. 1,1. T IT LE (Incirot Securi ty Ciassificalion) (U L t ra High Vacuum Spattering System _1__ 12. PERSONAL...ABSTRACT (Continue on reuerse it necessary and identify by bioc, number) This grant provided for the purchase of an ultra high vacuum sputtering system, for...FOR GRANT FROM DEFENSE UNIVERSITY RESEARCH INSTRUMENTATION PROGRAM Grant no. AFOSR-89-0138 Date Submitted: 27 July, 1991 Title: Ultra High Vacuum Sputtering

  7. Preferential sputtering effects of carbides

    International Nuclear Information System (INIS)

    Taglauer, E.; Varga, P.

    1983-01-01

    Results from sputtering of TaC and TiC by various ions ranging from Xe + to H + are presented. Different effects of preferential sputtering show up in the surface concentration of TaC and TiC due to bombardment with various ions. For TaC mainly mass effects are important whereas binding energy and particularly chemical effects are found in TiC. (G.Q.)

  8. Comparative study of the radio-frequency magnetron sputter deposited CaP films fabricated onto acid-etched or pulsed electron beam-treated titanium

    International Nuclear Information System (INIS)

    Surmeneva, M.A.; Surmenev, R.A.; Tyurin, A.I.; Mukhametkaliyev, T.M.; Teresov, A.D.; Koval, N.N.; Pirozhkova, T.S.; Shuvarin, I.A.; Oehr, C.

    2014-01-01

    This study investigated the effect of the substrate morphology introduced by various substrate preparation techniques, namely acid etching (AE) and pulsed electron beam (PEB) treatments, on the CaP film morphology and mechanical properties. The morphology, nanohardness, and Young's modulus of the CaP coating deposited via radio-frequency (RF) magnetron sputtering were investigated by X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM), scanning electron microscopy and nanoindentation studies. The Ca/P ratios of the CaP coating deposited via RF magnetron sputtering onto titanium substrates treated using AE and PEB according to XPS were 1.73 ± 0.03 and 1.72 ± 0.04, respectively, which is close to the Ca/P ratio of 1.67 typical for stoichiometric hydroxyapatite (HA). The AFM experiments and nanoindentation studies revealed significant differences in the morphology and mechanical responses of the CaP films deposited onto acid-etched titanium substrates treated with PEB. Deposition of the CaP coating onto the acid-etched surface resulted in a rough surface with the presence of an island-like morphology. The CaP coating onto a smooth titanium substrate treated by PEB exhibited grains with irregular shapes and decreased size. The nanoindentation hardness and the Young's modulus of the HA coating deposited onto titanium treated by the PEB treatment were determined to be 7.0 ± 0.3 and 124 ± 3 GPa, respectively, which are significantly higher than those of the CaP coating on the acid-etched titanium substrates. Moreover, the elastic strain to failure (H/E), the plastic deformation resistance (H 3 /E 2 ), and the percent elastic recovery %R of the HA coating on titanium after surface irradiation with an electron energy density of 15 J·cm −2 were determined to increase by ∼ 23%, ∼ 70% and ∼ 53%, respectively, compared to the CaP coating on acid-etched titanium. - Highlights: • Island-like morphology of calcium phosphate coating on

  9. Contribution to the study of sputtering and damage of uranium dioxide by fast heavy ions; Contribution a l'etude de la pulverisation et de l'endommagement du dioxyde d'uranium par les ions lourds rapides

    Energy Technology Data Exchange (ETDEWEB)

    Schlutig, S

    2001-03-01

    Swift heavy ion-solid interaction leads in volume to track creation and on the surface to the ejection of particles into the vacuum. To learn more about initial mechanisms of track formation, we are focused on the sputtering of uranium dioxide by fast heavy ions. This present study is exclusively devoted to the influence of the electronic stopping power on the emission of neutral particles and especially on their angular distribution. These measurements are completed by those of the ions emitted from UO{sub 2} targets bombarded with swift heavy ions. The whole experimental results give access to: i) the nature of the sputtered particles; ii) the charge state of the emitted particles; iii) the direction of ejection of the sputtered particles ; iv) the sputtering yields deduced from the angular distributions. These results are compared to the prediction of the sputtering models proposed in the literature and it seems that the supersonic gas flow model is well suited to describe our results. Finally, the sputtering yields are compared with a set of earlier experimental data on uranium dioxide damage obtained by T. Wiss and we observe that only a small fraction of UO{sub 2} monolayers are sputtered. (author)

  10. armax, oe and ssif model predictors for power transmission and ...

    African Journals Online (AJOL)

    Vincent

    prediction and tracking capabilities and that the OE model structure and its predictor structure can be used for power transmission ..... Cable Size: Larger cable size will have less voltage than smaller cable size of the same length; 3). Cable Length: shorter cables will have less voltage drop than longer cables of the same.

  11. The OE-A OPV demonstrator anno domini 2011

    NARCIS (Netherlands)

    Krebs, F.C.; Fyenbo, J.; Tanenbaum, D.M.; Gevorgyan, S.A.; Andriessen, H.A.J.M.; Remoortere, B. van; Galagan, Y.O.; Jørgensen, M.

    2011-01-01

    Polymer solar cells were prepared in large numbers using roll-to-roll methods and were subsequently integrated into the Organic Electronics Association (OE-A) demonstrator in the year 2011 and presented as a small credit card sized lamp with a flat outline. The lamp comprised the polymer solar cell

  12. Co-ordination Action on Ocean Energy (CA-OE)

    DEFF Research Database (Denmark)

    Tedd, James; Frigaard, Peter

    In October 2004, the Co-ordination Action on Ocean Energy (CA-OE) was launched, co-financed by the European Commission, under the Renewable Energy Technologies priority within the 6th Framework programme, contract number 502701, chaired by Kim Nielsen, Rambøll, Denmark. The project involves 41...

  13. ARMAX, OE and SSIF model predictors for power transmission and ...

    African Journals Online (AJOL)

    Three mathematical model structures, namely: ARMAX, OE and a SSIF are first formulated followed by the formulation of their respective model predictors for the model identification and prediction of power transmission and distribution within Akure and its environs. A total of 51,350 data samples from the Power Holding ...

  14. SLURRY NEBULIZATION ICP-OES FOR THE DETERMINATION OF ...

    African Journals Online (AJOL)

    a

    ABSTRACT. A method that involves analysis of bovine liver by slurry nebulization and ICP-OES has been developed. This method permits rapid and accurate determination of Cu, Fe, Mg, Mn and Zn in bovine liver. Aliquots of freeze-dried and powdered bovine liver sample were dispersed in 2.0 M HNO3 and sonicated to.

  15. Fabrication, ultra-structure characterization and in vitro studies of RF magnetron sputter deposited nano-hydroxyapatite thin films for biomedical applications

    Science.gov (United States)

    Surmeneva, Maria A.; Surmenev, Roman A.; Nikonova, Yulia A.; Selezneva, Irina I.; Ivanova, Anna A.; Putlyaev, Valery I.; Prymak, Oleg; Epple, Matthias

    2014-10-01

    A series of nanostructured low-crystalline hydroxyapatite (HA) coatings averaging 170, 250, and 440 nm in thickness were deposited onto previously etched titanium substrates through radio-frequency (RF) magnetron sputtering. The HA coatings were analyzed using infrared spectroscopy (FTIR), X-ray diffraction (XRD), and scanning and transmission electron microscopy (SEM and TEM). Cross sections of the thin specimens were prepared by FIB to study the microstructure of the coatings by TEM. The deposition process formed nano-scale grains, generating an amorphous layer at the substrate/coating interface and inducing the growth of a columnar grain structure perpendicular to the substrate surface. A microstructural analysis of the film confirmed that the grain size and crystallinity increased when increasing the deposition time. The nanostructured HA coatings were not cytotoxic, as proven by in vitro assays using primary dental pulp stem cells and mouse fibroblast NCTC clone L929 cells. Low-crystallinity HA coatings with different thicknesses stimulated cells to attach, proliferate and form mineralized nodules on the surface better than uncoated titanium substrates.

  16. Fabrication, ultra-structure characterization and in vitro studies of RF magnetron sputter deposited nano-hydroxyapatite thin films for biomedical applications

    Energy Technology Data Exchange (ETDEWEB)

    Surmeneva, Maria A. [Department of Theoretical and Experimental Physics, National Research Tomsk Polytechnic University, Tomsk 634050 (Russian Federation); Surmenev, Roman A., E-mail: rsurmenev@gmail.com [Department of Theoretical and Experimental Physics, National Research Tomsk Polytechnic University, Tomsk 634050 (Russian Federation); Fraunhofer Institute for Interfacial Engineering and Biotechnology IGB, 70569 Stuttgart (Germany); Nikonova, Yulia A.; Selezneva, Irina I. [Institute of Theoretical and Experimental Biophysics, Russian Academy of Sciences, Pushchino 142292 (Russian Federation); Ivanova, Anna A. [Department of Theoretical and Experimental Physics, National Research Tomsk Polytechnic University, Tomsk 634050 (Russian Federation); Putlyaev, Valery I. [Department of Chemistry, Moscow State University, Vorobievi Gory, 1, Moscow 119991 (Russian Federation); Prymak, Oleg; Epple, Matthias [Inorganic Chemistry and Center for Nanointegration Duisburg-Essen (CeNIDE), University of Duisburg-Essen, 45117 Essen (Germany)

    2014-10-30

    Highlights: • Growth of a columnar grain structure perpendicular to the substrate surface was observed. • Interplanar spacing distances measured using HRTEM were 0.82 and 0.28 nm, corresponding to the (0 0 1) and (2 1 1) lattice planes of hexagonal HA. • Grain size and crystallinity increased when increasing the deposition time. • Nanometer-thick low-crystallinity HA coatings with different thicknesses stimulated cells to attach, proliferate and form mineralized nodules. - Abstract: A series of nanostructured low-crystalline hydroxyapatite (HA) coatings averaging 170, 250, and 440 nm in thickness were deposited onto previously etched titanium substrates through radio-frequency (RF) magnetron sputtering. The HA coatings were analyzed using infrared spectroscopy (FTIR), X-ray diffraction (XRD), and scanning and transmission electron microscopy (SEM and TEM). Cross sections of the thin specimens were prepared by FIB to study the microstructure of the coatings by TEM. The deposition process formed nano-scale grains, generating an amorphous layer at the substrate/coating interface and inducing the growth of a columnar grain structure perpendicular to the substrate surface. A microstructural analysis of the film confirmed that the grain size and crystallinity increased when increasing the deposition time. The nanostructured HA coatings were not cytotoxic, as proven by in vitro assays using primary dental pulp stem cells and mouse fibroblast NCTC clone L929 cells. Low-crystallinity HA coatings with different thicknesses stimulated cells to attach, proliferate and form mineralized nodules on the surface better than uncoated titanium substrates.

  17. Spectro-ellipsometric studies of sputtered amorphous Titanium dioxide thin films: simultaneous determination of refractive index, extinction coefficient, and void distribution

    CERN Document Server

    Lee, S I; Oh, S G

    1999-01-01

    Amorphous titanium dioxide thin films were deposited onto silicon substrates by using RF magnetron sputtering, and the index of refraction, the extinction coefficient, and the void distribution of these films were simultaneously determined from the analyses of there ellipsometric spectra. In particular, our novel strategy, which combines the merits of multi-sample fitting, the dual dispersion function, and grid search, was proven successful in determining optical constants over a wide energy range, including the energy region where the extinction coefficient was large. Moreover, we found that the void distribution was dependent on the deposition conditions, such as the sputtering power, the substrate temperature, and the substrate surface.

  18. Ion sputtering of minerals and glasses: a first step to the simulation of solar wind erosion

    Energy Technology Data Exchange (ETDEWEB)

    Thiel, K.; Sassmannshausen, U.; Kuelzer, H.; Herr, W. (Koeln Univ. (Germany, F.R.). Inst. fuer Kernchemie)

    1982-09-01

    Selected rockforming minerals (plagioclase, augite, olivine, ilmenite, silicate and metal phases of the meteorite 'Brenham') as well as silicate and phosphate glasses were irradiated with heavy ions (/sup 4/He/sup +/, /sup 14/N/sup +/, /sup 20/Ne/sup +/, /sup 40/Ar/sup +/, /sup 56/Fe/sup +/, Xe/sup +/sub(nat)) in the energy range of 50 to 130 keV in order to study ion-induced sputtering. Sputtering yields were measured independently by means of multiple beam interferometry and particle track autoradiography. The theory of sputtering by Sigmund, modified by Smith, was used to convert experimental heavy ion sputtering yields to H/sup +/- and He/sup +/-sputtering yields of the same target. Taking into account solar wind irradiation conditions at the lunar surface, an estimate of lunar erosion rates due to solar wind sputtering is given for the targets studied.

  19. Plasma polymer films rf sputtered from PTFE under various argon pressures

    Czech Academy of Sciences Publication Activity Database

    Stelmashuk, Vitaliy; Biederman, H.; Slavinská, D.; Zemek, Josef; Trchová, Miroslava

    2005-01-01

    Roč. 77, č. 2 (2005), s. 131-137 ISSN 0042-207X R&D Projects: GA MŠk(CZ) OC 527.10; GA MŠk(CZ) OC 527.90 Grant - others:EUREKAΣ2080(XE) OE57 Institutional research plan: CEZ:AV0Z10100521; CEZ:AV0Z20430508 Keywords : RF sputtering * PTFE * fluorcarbon plasma polymers * thin film * teflon * deposition Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 0.909, year: 2005

  20. High Transparent Conductive Aluminum-Doped Zinc Oxide Thin Films by Reactive Co-Sputtering (Postprint)

    Science.gov (United States)

    2016-03-30

    studied such as pulse DC magnetron sputtering with an AZO target [1], RF multi- metallic -target reactive magnetron sputtering [2-3], RF and DC magnetron...Experimental details The AZO films were fabricated using reactive magnetron co-sputtering in an O2 and Ar plasma. The two metallic targets, Zn (50 mm...nm using a Varian Cary 5000 UV-Vis-NIR spectrophotometer . The crystal structure of the films was analyzed by a Distribution A. Approved for public

  1. AFM characterization of nonwoven material functionalized by ZnO sputter coating

    International Nuclear Information System (INIS)

    Deng Bingyao; Yan Xiong; Wei Qufu; Gao Weidong

    2007-01-01

    Sputter coatings provide new approaches to the surface functionalization of textile materials. In this study, polyethylene terephthalate (PET) nonwoven material was used as a substrate for creating functional nanostructures on the fiber surfaces. A magnetron sputter coating was used to deposit functional zinc oxide (ZnO) nanostructures onto the nonwoven substrate. The evolution of the surface morphology of the fibers in the nonwoven web was examined using atomic force microscopy (AFM). The AFM observations revealed a significant difference in the morphology of the fibers before and after the sputter coating. The AFM images also indicated the effect of the sputtering conditions on the surface morphology of the fibers. The increase in the sputtering time led to the growth of the ZnO grains on the fiber surfaces. The higher pressure in the sputtering chamber could cause the formation of larger grains on the fiber surfaces. The higher power used also generated larger grains on the fiber surfaces

  2. Rapidity gaps between jets at D OE

    International Nuclear Information System (INIS)

    Abachi, S.

    1996-07-01

    We present studies of jet production via color-singlet events with low particle multiplicity between the jets. A preliminary study of the multiplicity in other regions of the color singlet events and the dependence of color-singlet exchange on jet transverse energy is also presented

  3. Laser sputter neutral mass spectrometry

    Energy Technology Data Exchange (ETDEWEB)

    King, B.V.; Clarke, M.; Hu, H.; Betz [Newcastle Univ., NSW (Australia). Dept. of Physics

    1993-12-31

    Laser sputter neutral mass spectrometry (LSNMS) is an emerging technique for highly sensitive surface analysis. In this technique a target is bombarded with a pulsed beam of keV ions. The sputtered particles are intercepted by a high intensity pulsed laser beam above the surface and ionised with almost 100% efficiency. The photions may then be mass analysed using a quadrupole or, more commonly, using time of flight (TOF) techniques. In this method photoions are extracted from the ionisation region, accelerated to a known energy E{sub o} and strike a channelplate detector a distance `d` away. The flight time `t` of the photoions is then related to their mass by `d` {radical}m / {radical} 2E{sub o} so measurement of `t` allows mass spectra to be obtained. It is found that LSNMS is an emerging technique of great sensitivity and flexibility, useful for both applied analysis and to investigate basic sputtering processes. 4 refs., 3 figs.

  4. Imaging with Mass Spectrometry: A SIMS and VUV-Photoionization Study of Ion-Sputtered Atoms and Clusters from GaAs and Au

    Energy Technology Data Exchange (ETDEWEB)

    Takahashi, Lynelle; Zhou, Jia; Wilson, Kevin R.; Leone, Stephen R.; Ahmed, Musahid

    2008-12-05

    A new mass spectrometry surface imaging method is presented in which ion-sputtered neutrals are postionized by wavelength-tunable vacuum ultraviolet (VUV) light from a synchrotron source. Mass spectra and signal counts of the photoionized neutrals from GaAs (100) and Au are compared to those of the secondary ions. While clusters larger than dimers are more efficiently detected as secondary ions, certain species, such as As2, Au and Au2, are more efficiently detected through the neutral channel. Continuously tuning the photon wavelength allows photoionization efficiency (PIE) curves to be obtained for sputtered Asm (m=1,2) and Aun (n=1-4). From the observed ionization thresholds, sputtered neutral As and Au show no clear evidence of electronic excitation, while neutral clusters have photoionization onsets shifted to lower energies by ~;;0.3 eV. These shifts are attributed to unresolved vibrational and rotational excitations. High-spatial resolution chemical imaging with synchrotron VUV postionization is demonstrated at two different photon energies using a copper TEM grid embedded in indium. The resulting images are used to illustrate the use of tunable VUV light for verifying mass peak assignments by exploiting the unique wavelength-dependent PIE of each sputtered neutral species. This capability is valuable for identifying compounds when imaging chemically complex systems with mass spectrometry-based techniques.

  5. Application of high rate magnetron sputtering to the fabrication of A-15 compounds

    International Nuclear Information System (INIS)

    Kampwirth, R.T.; Hafstrom, J.W.; Wu, C.T.

    1976-01-01

    High quality Nb 3 Sn films have been fabricated using a recently developed magnetron sputtering process capable of deposition rates approaching 1 μm/min. at sputtering voltages less than 500 V and power levels of about 5 KW. Low sputtering voltages allow more complete thermalization at lower pressures of the material condensing on the substrate which can improve long range order. Transition temperatures of up to 18.3 0 K, J/sub c/(O)'s of 15 x 10 6 A/cm 2 and Hc 2 as high as 240 kOe have been achieved in 1-3 μm films deposited from a Nb 3 Sn reacted powder target with substrate temperatures between 600 and 800 0 C. The films exhibit smooth surfaces and, generally, a [200] preferred orientation. The growth of the film is columnar in nature. The sputtering parameters, substrate material and temperature will be related to film structure T/sub c/ and J/sub c/(H,T) and the Nb/Sn ratio as determined by Rutherford backscattering

  6. Faraday screen sputtering on TPX

    International Nuclear Information System (INIS)

    Ehst, D.A.

    1994-12-01

    The TPX design stipulates that the ion-cyclotron resonance frequency (ICRF) antenna must have a Faraday screen (FS). The author considers here possible low Z coatings for the screen, as well as sputtering behavior of the Ni and Ti substrates. The theory of rf-induced sputtering has been developed, and he follows those theoretical approaches. The author's emphasis will be on both impurity generation as a possible source of increased Z eff , and also on actual erosion-lifetime of the materials under worst case conditions

  7. D OE top quark mass analysis

    International Nuclear Information System (INIS)

    Strovink, M.

    1995-07-01

    Based on (44-48 pb -1 ) of lepton + jets data, we review D0's initial analysis of the top quark mass. The result, M top = 199 ± 19/21 (stat.) ± 22 (syst.) GeV/c 2 , is insensitive to background normalization. The errors are based on ISAJET top Monte Carlo, with its more severe gluon radiation, and allow for ISAJET/HERWIG differences. Good progress is being made in reducing the systematic error. We present a new study based on two-dimensional distributions of reconstructed top quark vs. dijet mass. With 98.7% confidence we observe a peak in the top mass - dijet mass plane. The peak and its projections are similar both in shape and magnitude to expectations based on the decay sequence 1 → bW, W → jj

  8. Kinetic and Potential Sputtering of Lunar Regolith: Contribution of Solar-Wind Heavy Ions

    Science.gov (United States)

    Meyer, F. W.; Harris, P. R.; Meyer, H. M., III; Hijiazi, H.; Barghouty, A. F.

    2013-01-01

    Sputtering of lunar regolith by protons as well as solar-wind heavy ions is considered. From preliminary measurements of H+, Ar+1, Ar+6 and Ar+9 ion sputtering of JSC-1A AGGL lunar regolith simulant at solar wind velocities, and TRIM simulations of kinetic sputtering yields, the relative contributions of kinetic and potential sputtering contributions are estimated. An 80-fold enhancement of oxygen sputtering by Ar+ over same-velocity H+, and an additional x2 increase for Ar+9 over same-velocity Ar+ was measured. This enhancement persisted to the maximum fluences investigated is approximately 1016/cm (exp2). Modeling studies including the enhanced oxygen ejection by potential sputtering due to the minority heavy ion multicharged ion solar wind component, and the kinetic sputtering contribution of all solar wind constituents, as determined from TRIM sputtering simulations, indicate an overall 35% reduction of near-surface oxygen abundance. XPS analyses of simulant samples exposed to singly and multicharged Ar ions show the characteristic signature of reduced (metallic) Fe, consistent with the preferential ejection of oxygen atoms that can occur in potential sputtering of some metal oxides.

  9. Accelerated onset of the vesicovesical reflex in postnatal NGF-OE mice and the role of neuropeptides.

    Science.gov (United States)

    Girard, Beatrice; Peterson, Abbey; Malley, Susan; Vizzard, Margaret A

    2016-11-01

    the maturation of the micturition reflex and are excitatory to the micturition reflex in postnatal NGF-OE mice. These studies provide insight into the mechanisms that contribute to the postnatal development of the micturition reflex. Copyright © 2016 Elsevier Inc. All rights reserved.

  10. Sputtering technology in solid film lubrication

    Science.gov (United States)

    Spalvins, T.

    1978-01-01

    Potential and present sputtering technology is discussed as it applies to the deposition of solid film lubricants particularly MoS2, WS2, and PTFE. Since the sputtered films are very thin, the selection of the sputtering parameters and substrate condition is very critical as reflected by the lubricating properties. It was shown with sputtered MoS2 films that the lubricating characteristics are directly affected by the selected sputtering parameters (power density, pressure, sputter etching, dc-biasing, etc.) and the substrate temperature, chemistry, topography and the environmental conditions during the friction tests. Electron microscopy and other surface sensitive analytical techniques illustrate the resulting changes in sputtered MoS2 film morphology and chemistry which directly influence the film adherence and frictional properties.

  11. Interaction of ions with surfaces: sputtering of secondary ions from lithium fluoride LiF studied by XY-TOF-SIMS

    International Nuclear Information System (INIS)

    Hijazi, H.

    2011-01-01

    The deposition of energy lost by a fast ionic projectile in the target leads to the ejection of material in the form of atoms or clusters ('sputtering'). The measurements of yields, energy and angular distributions of sputtered particles contribute to the understanding of the initial microscopic processes of damage and defect creation in materials. A new UHV system (AODO) allows measuring the mass distributions and the velocity vectors of each emitted secondary ion by means of time-of-flight and imaging techniques XY-TOF-SIMS ('Secondary Ion Mass Spectroscopy') with well prepared target surfaces. Here, we focus on the sputtering of lithium fluoride (an ionic crystal, a large band gap insulator ≅ 14 eV) by fast heavy ions (≅ 10 MeV/u). As a function of the electronic stopping power S e , two regimes for the evolution of secondary ions yield Y with S e are observed. At low S e (≤ 8 keV/nm), weak perturbation regime, Y ∼ Se 2 . At high S e (≥ 8 keV/nm), strong perturbation regime, a saturation (Y = constant) is observed. The experimental data permit also to test the theoretical models existing in the literature (shock wave model, thermal spike, Coulomb explosion...). It appears that none of these models can correctly describe the ensemble of the experimental observations. However, the Maxwell-Boltzmann distribution describes the energy distributions of the emitted ions. This gives us a possible indication that the processes generating the sputtering could be mainly of thermal origin. (author)

  12. Spectroelectrochemical and morphological studies of the ageing of silver nanoparticles embedded in ultra-thin perfluorinated sputter deposited films

    Energy Technology Data Exchange (ETDEWEB)

    Ebbert, C., E-mail: ebbert@tc.upb.de [University of Paderborn, Faculty of Natural Science, Technical and Macromolecular Chemistry, Warburger Str. 100, 33098 Paderborn (Germany); Alissawi, N. [Institute for Materials Science, Christian-Albrechts University at Kiel, Kaiserstr. 2, 24143 Kiel (Germany); Somsen, C.; Eggeler, G. [Institute of Materials, Department of Mechanical Engineering, Ruhr-University Bochum, Universitaetst. 150, 44780 Bochum (Germany); Strunskus, T.; Faupel, F. [Institute for Materials Science, Christian-Albrechts University at Kiel, Kaiserstr. 2, 24143 Kiel (Germany); Grundmeier, G. [University of Paderborn, Faculty of Natural Science, Technical and Macromolecular Chemistry, Warburger Str. 100, 33098 Paderborn (Germany)

    2014-11-28

    This paper focuses on the investigation of the ageing behaviour of silver nanoparticle containing polytetrafluoroethylene thin films during exposure to phosphate buffer solution (pH = 7.5). In order to investigate the effect of the electrical connection between the silver nanoparticles via a conductive substrate, two kinds of composite films were compared. One model where the nanoparticles are directly deposited on an inert conducting substrate and then covered by an ultra-thin polytetrafluoroethylene like film. In the second case a polytetrafluoroethylene/silver nanoparticle/polytetrafluoroethylene sandwich film was prepared on the same substrate to prevent electrical connection of the silver nanoparticles. Degradation was followed in-situ by means of the combination of ultraviolet–visible spectroscopy and electrochemical impedance spectroscopy. In the case of electrically connected nanoparticles electrochemical Ostwald ripening took place, while this process was not observed for the insulated nanoparticles. The electrochemical impedance spectroscopy studies allowed for the parallel study of the correlated loss of barrier properties. Transmission electron microscopy images of both composite films confirmed the results obtained by means of the in situ electrochemical ultraviolet–visible studies. - Highlights: • Nanoparticle in polymer films could be analysed by a spectroelectrochemical approach. • Transmission electron microscopy analysis proved an Ostwald-ripening process. • Embedding of the silver nanoparticles inhibits the Ostwald-ripening process.

  13. The corrosion and passivity of sputtered Mg–Ti alloys

    International Nuclear Information System (INIS)

    Song, Guang-Ling; Unocic, Kinga A.; Meyer, Harry; Cakmak, Ercan; Brady, Michael P.; Gannon, Paul E.; Himmer, Phil; Andrews, Quinn

    2016-01-01

    Highlights: • A supersaturated single phase Mg–Ti alloy can be obtained by magnetron sputtering. • The anodic dissolution of Mg–Ti alloy is inhibited by Ti addition. • The alloy becomes passive when Ti content is high and the alloy has become Ti based. • The formation of a continuous thin passive film is responsible for the passivation of the alloy. - Abstract: This study explored the possibility of forming a “stainless” Mg–Ti alloy. The electrochemical behavior of magnetron-sputtered Mg–Ti alloys was measured in a NaCl solution, and the surface films on the alloys were examined by XPS, SEM and TEM. Increased corrosion resistance was observed with increased Ti content in the sputtered Mg–Ti alloys, but passive-like behavior was not reached until the Ti level (atomic %) was higher than the Mg level. The surface film that formed on sputtered Mg–Ti based alloys in NaCl solution was thick, discontinuous and non-protective, whereas a thin, continuous and protective Mg and Ti oxide film was formed on a sputtered Ti–Mg based alloy.

  14. Fabrication and Physical Properties of Titanium Nitride/Hydroxyapatite Composites on Polyether Ether Ketone by RF Magnetron Sputtering Technique

    Science.gov (United States)

    Nupangtha, W.; Boonyawan, D.

    2017-09-01

    Titanium nitride (TiN) coatings have been used very successfully in a variety of applications because of their excellent properties, such as the high hardness meaning good wear resistance and also used for covering medical implants. Hydroxyapatite is a bioactive ceramic that contributes to the restoration of bone tissue, which together with titanium nitride may contribute to obtaining a superior composite in terms of mechanical and bone tissue interaction matters. This paper aims to explain how to optimize deposition conditions for films synthesis on PEEK by varying sputtering parameters such as nitrogen flow rate and direction, deposition time, d-s (target-to-substrate distance) and 13.56 MHz RF power. The plasma conditions used to deposit films were monitored by the optical emission spectroscopy (OES). Titanium nitride/Hydroxyapatite composite films were performed by gas mixture with nitrogen and argon ratio of 1:3 and target-to-substrate distance at 8 cm. The gold colour, as-deposited film was found on PEEK with high hardness and higher surface energy than uncoated PEEK. X-ray diffraction characterization study was carried to study the crystal structural properties of these composites.

  15. Study of the oxidation resistance of ZrxNand ZrxSi1-xN thin films deposited by reactive magnetron sputtering; Estudo da resistencia a oxidacao de filmes finos de ZrxN e ZrxSi1-xN depositados por magnetron sputtering reativo

    Energy Technology Data Exchange (ETDEWEB)

    Fernandez, D.R.; Freitas, F.G.R.; Felix, L.C.; Carvalho, R.G.; Fontes Junior, A.S.; Tentardini, E.K., E-mail: daniel.angel0275@gmail.com [Universidade Federal de Sergipe (UFS), Sao Cristovao, SE (Brazil). Departamento de Ciencia e Engenharia de Materiais; Silva Junior, H. da [Universidade Federal do Rio Grande do Sul (UFRGS), Porto Alegre, RS (Brazil)

    2016-07-01

    The objective of this work is to evaluate the oxidation resistance on pure zirconium nitride thin films and with silicon addition (ZrN and ZrSiN respectively). The thin films deposition were performed using reactive magnetron sputtering. The coatings were characterized by Rutherford Backscattering Spectroscopy (RBS), grazing angle X ray diffraction (GAXRD), scanning electronic microscopy (SEM-FEG) and oxidation tests starting from 500°C to 700°C. This study evaluated thin films with silicon content up to 14,9 at.%. GAXRD results showed only ZrN characteristics peaks, which allow the inference that Si3N4 has an amorphous structure. Oxidation tests demonstrate that the film with highest silicon content shows an increase of 200°C in oxidation temperature when compared with ZrN pure thin film. (author)

  16. Mechanical and structural properties of sputtered Ni/Ti multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Senthil Kumar, M.; Boeni, P.; Tixier, S.; Clemens, D.; Horisberger, M. [Paul Scherrer Inst. (PSI), Villigen (Switzerland)

    1997-09-01

    Ni/Ti bilayers have been prepared by dc-magnetron sputtering in order to study their mechanical and structural properties. A remarkable reduction of stress is observed when the Ni layers are sputtered reactively in argon with a high partial pressure of air. The high angle x-ray diffraction studies show a tendency towards amorphisation of the Ni layers with increasing air flow. The low angle measurements indicate a substantial reduction of interdiffusion resulting in smoother interfaces with increasing air content. (author) 2 figs., 2 refs.

  17. Influence of ferroelectric layer on artificial multiferroic LSMO/BTO bilayers deposited by Dc and RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Ordonez, J. E.; Gomez, M. E.; Lopera, W. [Universidad del Valle, Department of Physics, A. A. 25360 Cali (Colombia)

    2016-11-01

    La{sub 2/3}Sr{sub 1/3}MnO{sub 3} (LSMO)/BaTiO{sub 3} (BTO) bilayers were deposited on (001) SrTiO{sub 3} substrates via Dc and RF sputtering at pure oxygen atmosphere at a substrate temperature of 830 degrees Celsius. We studied the structural, electrical and magnetic properties on LSMO/BTO bilayers, when LSMO thickness is fixed at nm and BTO thickness is varied from 20 to 100 nm. Reciprocal Space Maps in LSMO show a strained growth for all samples, while BTO layers are always relaxed. Magnetization and electrical measurements indicate the influence of the ferroelectric layer, due to saturation magnetization increases from 500 to 590 emu/cm{sup 3} and coercive field decreases from 178 to 82 Oe with BTO thickness. Mean Field mechanism is identified on all samples with critical exponent β between 0.42 and 0.54. Resistivity measurements show electron-electron and magnon-magnon scattering conduction mechanisms. The influence on magnetic and electrical properties of bilayers with BTO thickness is attributed to crystallographic strains at the interface and the corresponding relaxation with increasing BTO layer thickness. The thickness of the individual layers were obtained by X-ray reflectivity measurements in the bilayers, not shown. X-ray diffraction and Reciprocal Space Maps measurements show highly textured layers with preferential growth in the c-axis direction. (Author)

  18. Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation

    OpenAIRE

    Schroeder, Jeremy; Thomson, W.; Howard, B.; Schell, N.; Näslund, Lars-Åke; Rogström, Lina; Johansson-Jöesaar, Mats P.; Ghafoor, Naureen; Odén, Magnus; Nothnagel, E.; Shepard, A.; Greer, J.; Birch, Jens

    2015-01-01

    We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and cathodic arc deposition system purposefully designed for time-resolved in situ thin film deposition/annealing studies using high-energy (greater than50 keV), high photon flux (greater than10(12) ph/s) synchrotron radiation. The high photon flux, combined with a fast-acquisition-time (less than1 s) two-dimensional (2D) detector, permits time-resolved in situ structural analysis of thin film formation...

  19. Search for new gauge bosons at D OE

    International Nuclear Information System (INIS)

    1994-09-01

    The authors have searched for evidence of W' → eν and Z' → ee in data collected with the D OE detector at the Tevatron during the 1992--1993 p anti p collider run at √s = 1.8 TeV. They exclude the existence of a W' of mass less than 600 GeV/c 2 and a Z' of mass less than 480 GeV/c 2 at the 95% confidence level, assuming standard model couplings to quarks and leptons

  20. Arc generation from sputtering plasma-dielectric inclusion interactions

    International Nuclear Information System (INIS)

    Wickersham, C.E. Jr.; Poole, J.E.; Fan, J.S.

    2002-01-01

    Arcing during sputter deposition and etching is a significant cause of particle defect generation during device fabrication. In this article we report on the effect of aluminum oxide inclusion size, shape, and orientation on the propensity for arcing during sputtering of aluminum targets. The size, shape, and orientation of a dielectric inclusion plays a major role in determining the propensity for arcing and macroparticle emission. In previous studies we found that there is a critical inclusion size required for arcing to occur. In this article we used high-speed videos, electric arc detection, and measurements of particle defect density on wafers to study the effect of Al 2 O 3 inclusion size, shape, and orientation on arc rate, intensity, and silicon wafer particle defect density. We found that the cross-sectional area of the inclusion exposed to the sputtering plasma is the critical parameter that determines the arc rate and rate of macroparticle emission. Analysis of the arc rate, particle defect density, and the intensity of the optical emission from the arcing plasma indicates that the critical aluminum oxide inclusion area for arcing is 0.22±0.1 mm2 when the sputtering plasma sheath dark-space λ d , is 0.51 mm. Inclusions with areas greater than this critical value readily induce arcing and macroparticle ejection during sputtering. Inclusions below this critical size do not cause arcing or macroparticle ejection. When the inclusion major axis is longer than 2λ d and lies perpendicular to the sputter erosion track tangent, the arcing activity increases significantly over the case where the inclusion major axis lies parallel to the erosion track tangent

  1. Nanoporous zinc oxide films prepared by magnetron sputtering

    International Nuclear Information System (INIS)

    Ghimpu, L.; Lupan, O.; Popescu, L.; Tiginyanu, I.M.

    2011-01-01

    In this paper we demonstrate an inexpensive approach for the fabrication of nanoporous zinc oxide films by using magnetron sputtering. Study of the structural properties proves the crystallographic perfection of porous nanostructures and the possibility of its controlling by adjusting the technological parameters in the growth process. The XRD pattern of nanoporous ZnO films exhibits high intensity of the peaks relative to the background signal which is indicative of the ZnO hexagonal phase and a good crystallinity of the samples grown by magnetron sputtering.

  2. Uncertainty estimation in the determination of metals in superficial water by ICP-OES

    Science.gov (United States)

    Faustino, Mainara G.; Marques, Joyce R.; Monteiro, Lucilena R.; Stellato, Thamiris B.; Soares, Sabrina M. V.; Silva, Tatiane B. S. C.; da Silva, Douglas B.; Pires, Maria Aparecida F.; Cotrim, Marycel E. B.

    2016-07-01

    From validation studies, it was possible to estimate a measurement uncertainty of several elements such as Al, Ba, Ca, Cu, Cr, Cd, Fe, Mg, Mn, Ni and K in water samples from Guarapiranga Dam. These elements were analyzed by optical emission spectrometry with inductively coupled plasma (ICP-OES). The value of relative estimated uncertainties were between 3% and 15%. The greatest uncertainty contributions were analytical curve, and the recovery method, which were related with elements concentrations and the equipment response. Water samples analyzed were compared with CONAMA Resolution #357/2005.

  3. Dynamics of the sputtering of water from ice films by collisions with energetic xenon atoms.

    Science.gov (United States)

    Killelea, Daniel R; Gibson, K D; Yuan, Hanqiu; Becker, James S; Sibener, S J

    2012-04-14

    The flow of energy from the impact site of a heavy, translationally energetic xenon atom on an ice surface leads to several non-equilibrium events. The central focus of this paper is on the collision-induced desorption (sputtering) of water molecules into the gas-phase from the ice surface. Sputtering is strongly activated with respect to xenon translational energy, and a threshold for desorption was observed. To best understand these results, we discuss our findings in the context of other sputtering studies of molecular solids. The sputtering yield is quite small; differential measurements of the energy of xenon scattered from ice surfaces show that the ice efficiently accommodates the collisional energy. These results are important as they quantitatively elucidate the dynamics of such sputtering events, with implications for energetic non-equilibrium processes at interfaces.

  4. [Determination of high concentrations of rubidium chloride by ICP-OES].

    Science.gov (United States)

    Zhong, Yuan; Sun, Bai; Li, Hai-jun; Wang, Tao; Li, Wu; Song, Peng-sheng

    2015-01-01

    The method of ICP-OES for the direct determination of high content of rubidium in rubidium chloride solutions was studied through mass dilution method and optimizing parameters of the instrument in the present paper. It can reduce the times of dilution and the error introduced by the dilution, and improve the accuracy of determination results of rubidium. Through analyzing the sensitivity of the three detection spectral lines for rubidium ion, linearly dependent coefficient and the relative errors of the determination results, the spectral line of Rb 780. 023 nm was chosen as the most suitable wavelength to measure the high content of rubidium in the rubidium chloride solutions. It was found that the instrument parameters of ICP-OES such as the atomizer flow, the pump speed and the high-frequency power are the major factors for the determination of rubidium ion in the rubidium chloride solutions. As we know instrument parameters of ICP-OES have an important influence on the atomization efficiency as well as the emissive power of the spectral lines of rubidium, they are considered as the significant factors for the determination of rubidium. The optimization parameters of the instrument were obtained by orthogonal experiments and further single factor experiment, which are 0. 60 L . min-1 of atomizer flow, 60 r . min-1 of pump speed, and 1 150 W of high-frequency power. The same experiments were repeated a week later with the optimization parameters of the instrument, and the relative errors of the determination results are less than 0. 5% when the concentration of rubidium chloride ranged from 0. 09% to 0. 18%. As the concentration of rubidium chloride is 0. 06%, the relative errors of the determination results are -1. 7%. The determination of lithium chloride and potassium chloride in the high concentration of the aqueous solutions was studied under the condition of similar instrument parameters. It was found by comparison that the determination results of lithium

  5. Simulation experiments and solar wind sputtering

    International Nuclear Information System (INIS)

    Griffith, J.E.; Papanastassiou, D.A.; Russell, W.A.; Tombrello, T.A.; Weller, R.A.

    1978-01-01

    In order to isolate the role played by solar wind sputtering from other lunar surface phenomena a number of simulation experiments were performed, including isotope abundance measurements of Ca sputtered from terrestrial fluorite and plagioclase by 50-keV and 130-keV 14 N beams, measurement of the energy distribution of U atoms sputtered with 80-keV 40 Ar, and measurement of the fraction of sputtered U atoms which stick on the surfaces used to collect these atoms. 10 references

  6. Depth resolution and preferential sputtering in depth profiling of sharp interfaces

    Energy Technology Data Exchange (ETDEWEB)

    Hofmann, S. [Max Planck Institute for Intelligent Systems (formerly MPI for Metals Research), Heisenbergstrasse 3, D-70569 Stuttgart (Germany); Han, Y.S. [Department of Physics, Shantou University, 243 Daxue Road, Shantou, 515063 Guangdong (China); Wang, J.Y., E-mail: wangjy@stu.edu.cn [Department of Physics, Shantou University, 243 Daxue Road, Shantou, 515063 Guangdong (China)

    2017-07-15

    Highlights: • Interfacial depth resolution from MRI model depends on sputtering rate differences. • Depth resolution critically depends on the dominance of roughness or atomic mixing. • True (depth scale) and apparent (time scale) depth resolutions are different. • Average sputtering rate approximately yields true from apparent depth resolution. • Profiles by SIMS and XPS are different but similar to surface concentrations. - Abstract: The influence of preferential sputtering on depth resolution of sputter depth profiles is studied for different sputtering rates of the two components at an A/B interface. Surface concentration and intensity depth profiles on both the sputtering time scale (as measured) and the depth scale are obtained by calculations with an extended Mixing-Roughness-Information depth (MRI)-model. The results show a clear difference for the two extreme cases (a) preponderant roughness and (b) preponderant atomic mixing. In case (a), the interface width on the time scale (Δt(16–84%)) increases with preferential sputtering if the faster sputtering component is on top of the slower sputtering component, but the true resolution on the depth scale (Δz(16–84%)) stays constant. In case (b), the interface width on the time scale stays constant but the true resolution on the depth scale varies with preferential sputtering. For similar order of magnitude of the atomic mixing and the roughness parameters, a transition state between the two extremes is obtained. While the normalized intensity profile of SIMS represents that of the surface concentration, an additional broadening effect is encountered in XPS or AES by the influence of the mean electron escape depth which may even cause an additional matrix effect at the interface.

  7. Sputtering of solid deuterium by He-ions

    DEFF Research Database (Denmark)

    Schou, Jørgen; Stenum, B.; Pedrys, R.

    2001-01-01

    Sputtering of solid deuterium by bombardment of 3He+ and 4He+ ions was studied. Some features are similar to hydrogen ion bombardment of solid deuterium, but for the He-ions a significant contribution of elastic processes to the total yield can be identified. The thin-film enhancement is more...... pronounced than that for hydrogen projectiles in the same energy range....

  8. Sputtering of solid neon by keV hydrogen ions

    DEFF Research Database (Denmark)

    Ellegaard, Ole; Schou, Jørgen; Sørensen, H.

    1986-01-01

    Sputtering of solid Ne with the hydrogen ions H+1, H+2 and H+3 in the energy range 1–10 keV/atom has been studied by means of a quartz microbalance technique. No enhancement in the yield per atom for molecular ions was found. The results for hydrogen ions are compared with data for keV electrons...

  9. Beam optics optimization of a negative-ion sputter source

    Indian Academy of Sciences (India)

    A negative-ion sputter source has been studied in order to increase the beam intensity delivered by the Vivitron tandem injector. The aim was to characterize the influence on the beam intensity of some factors related to the configuration of the source such as the shape of the target holder, the target surface topography and ...

  10. Transition from linear to nonlinear sputtering of solid xenon

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1995-01-01

    Self-sputtering of solid xenon has been studied with molecular dynamics simulations as a model system for the transition from dominantly linear to strongly nonlinear effects. The simulation covered the projectile energy range from 20 to 750 eV. Within a relatively narrow range from 30 to 250 e...

  11. Residual stress in magnetron sputtered TiN

    NARCIS (Netherlands)

    Zoestbergen, E; de Hosson, J.T.M.; Brebbia, CA; Kenny, JM

    1999-01-01

    In this study magnetron sputtered TiN layers are investigated with X-ray diffraction. The measurements show that there is a texture present and in these layers a non-linear d-sin(2)psi behavior for the (200) planes was found. The latter cannot be explained by the well-known causes that may generate

  12. Pure and Nb2O5-doped TiO2 amorphous thin films grown by dc magnetron sputtering at room temperature: Surface and photo-induced hydrophilic conversion studies

    International Nuclear Information System (INIS)

    Suchea, M.; Christoulakis, S.; Tudose, I.V.; Vernardou, D.; Lygeraki, M.I.; Anastasiadis, S.H.; Kitsopoulos, T.; Kiriakidis, G.

    2007-01-01

    Photo-induced hydrophilicity of titanium dioxide makes this material one of the most suitable for various coating applications in antifogging mirrors and self-cleaning glasses. The field of functional titanium dioxide coatings is expanding rapidly not only in applications for glass but also in applications for polymer, metal and ceramic materials. The high hydrophilic surface of TiO 2 is interesting for understanding also the basic photon-related surface science of titanium dioxide. In doing so, it is inevitably necessary to understand the relationship between the photoreaction and the surface properties. In this work, photo-induced hydrophilic conversion was evaluated on amorphous pure and niobium oxide-doped titanium dioxide thin films on Corning 1737F glass grown by dc magnetron sputtering technique at room temperature. This study is focused on the influence of the Ar:O ratio during sputtering plasma deposition on thin film surface morphology and subsequent photo-induced hydrophilic conversion results. Structural characterization carried out by X-ray diffraction and atomic force microscopy (AFM) has shown that our films are amorphous and extremely smooth with a surface roughness bellow 1 nm. Contact angle measurements were performed on as-deposited and during/after 10 min UV exposure. We present evidence that the photo-induced hydrophilic conversion of film surface is directly correlated with surface morphology and can be controlled by growth conditions

  13. Application of spectroscopic techniques: ICP-OES, LA-ICP-MS and chemometric methods for studying the relationships between trace elements in clinical samples from patients with atherosclerosis obliterans.

    Science.gov (United States)

    Hanć, A; Komorowicz, I; Iskra, M; Majewski, W; Barałkiewicz, D

    2011-03-01

    The study was aimed to evaluate the influence of the vascular disease, atherosclerotic obliterans (AO), on the location and concentration of elements in the arterial wall and serum. Use of a modern method for studying element's concentration and distribution in samples of clinical material, i.e. laser ablation inductively coupled plasma mass spectrometry, is presented. Elements are not equally distributed between the inner (intima) and the outer (media + adventitia) layer of the arterial wall. Among the studied elements, calcium was found to have an unquestionable role in the calcification of the wall. Increased concentration of calcium found in the inner part of the atherosclerotic arterial wall and in the plaque, as compared to the control arterial wall samples, demonstrates the unquestionable role of this element in the calcification of the wall observed in AO. Applied chemometric methods were useful for demonstrating the differences in the element's concentration in blood serum and the arterial wall samples between AO and the control group.

  14. High precision measurement of silicon in naphthas by ICP-OES using isooctane as diluent.

    Science.gov (United States)

    Gazulla, M F; Rodrigo, M; Orduña, M; Ventura, M J; Andreu, C

    2017-03-01

    An analytical protocol for the accurate and precise determination of Si in naphthas is presented by using ICP-OES, optimizing from the sample preparation to the measurement conditions, in order to be able to analyze for the first time silicon contents below 100µgkg -1 in a relatively short time thus being used as a control method. In the petrochemical industry, silicon can be present as a contaminant in different petroleum products such as gasoline, ethanol, or naphthas, forming different silicon compounds during the treatment of these products that are irreversibly adsorbed onto catalyst surfaces decreasing its time life. The complex nature of the organic naphtha sample together with the low detection limits needed make the analysis of silicon quite difficult. The aim of this work is to optimize the measurement of silicon in naphthas by ICP-OES introducing as an improvement the use of isooctane as diluent. The set up was carried out by optimizing the measurement conditions (power, nebulizer flow, pump rate, read time, and viewing mode) and the sample preparation (type of diluent, cleaning process, blanks, and studying various dilution ratios depending on the sample characteristics). Copyright © 2016 Elsevier B.V. All rights reserved.

  15. Novel magnetic controlled plasma sputtering method

    International Nuclear Information System (INIS)

    Axelevich, A.; Rabinovich, E.; Golan, G.

    1996-01-01

    A novel method to improve thin film vacuum sputtering is presented. This method is capable of controlling the sputtering plasma via an external set of magnets, in a similar fashion to the tetrode sputtering method. The main advantage of the Magnetic Controlled Plasma Sputtering (MCPS) is its ability to independently control all deposition parameters without any interference or cross-talk. Deposition rate, using the MCPS, is found to be almost twice the rate of triode and tetrode sputtering techniques. Experimental results using the MCPS to deposit Ni layers are described. It was demonstrated that using the MCPS method the ion beam intensity at the target is a result of the interaction of a homogeneous external magnetic field and the controlling magnetic fields. The MCPS method was therefore found to be beneficial for the production of pure stoichiometric thin solid films with high reproducibility. This method could be used for the production of compound thin films as well. (authors)

  16. Measurements of beryllium sputtering yields at JET

    Science.gov (United States)

    Jet-Efda Contributors Stamp, M. F.; Krieger, K.; Brezinsek, S.

    2011-08-01

    The lifetime of the beryllium first wall in ITER will depend on erosion and redeposition processes. The physical sputtering yields for beryllium (both deuterium on beryllium (Be) and Be on Be) are of crucial importance since they drive the erosion process. Literature values of experimental sputtering yields show an order of magnitude variation so predictive modelling of ITER wall lifetimes has large uncertainty. We have reviewed the old beryllium yield experiments on JET and used current beryllium atomic data to produce revised beryllium sputtering yields. These experimental measurements have been compared with a simple physical sputtering model based on TRIM.SP beryllium yield data. Fair agreement is seen for beryllium yields from a clean beryllium limiter. However the yield on a beryllium divertor tile (with C/Be co-deposits) shows poor agreement at low electron temperatures indicating that the effect of the higher sputtering threshold for beryllium carbide is important.

  17. Plasma properties of RF magnetron sputtering system using Zn target

    Energy Technology Data Exchange (ETDEWEB)

    Nafarizal, N.; Andreas Albert, A. R.; Sharifah Amirah, A. S.; Salwa, O.; Riyaz Ahmad, M. A. [Microelectronic and Nanotechnology - Shamsuddin Research Centre (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia 86400 Parit Raja, Batu Pahat, Johor (Malaysia)

    2012-06-29

    In the present work, we investigate the fundamental properties of magnetron sputtering plasma using Zn target and its deposited Zn thin film. The magnetron sputtering plasma was produced using radio frequency (RF) power supply and Argon (Ar) as ambient gas. A Langmuir probe was used to collect the current from the plasma and from the current intensity, we calculate the electron density and electron temperature. The properties of Zn sputtering plasma at various discharge conditions were studied. At the RF power ranging from 20 to 100 W and gas pressure 5 mTorr, we found that the electron temperature was almost unchanged between 2-2.5 eV. On the other hand, the electron temperature increased drastically from 6 Multiplication-Sign 10{sup 9} to 1 Multiplication-Sign 10{sup 10}cm{sup -3} when the discharge gas pressure increased from 5 to 10 mTorr. The electron microscope images show that the grain size of Zn thin film increase when the discharge power is increased. This may be due to the enhancement of plasma density and sputtered Zn density.

  18. Photoluminescence study of trap-state defect on TiO2 thin films at different substrate temperature via RF magnetron sputtering

    Science.gov (United States)

    Abdullah, S. A.; Sahdan, M. Z.; Nafarizal, N.; Saim, H.; Bakri, A. S.; Cik Rohaida, C. H.; Adriyanto, F.; Sari, Y.

    2018-04-01

    This paper highlights the defect levels using photoluminescence spectroscopy of TiO2 thin films. The TiO2 were deposited by Magnetron Sputtering system with 200, 300, 400, and 500 °C substrate temperature on microscope glass substrate. The PL result shows profound effect of various substrate temperatures to defect levels of oxygen vacancies and Ti3+ at titanium interstitial site. Increasing temperature would minimize the oxygen vacancy defect, however Ti3+ shows otherwise. Green region of PL consist of trapped hole for oxygen vacancy, while red region of PL is trapped electron associated to structural defect Ti3+. Green PL is dominant peak at temperature 200 °C, indicating that oxygen vacancy is the main defect at this temperature. However, PL peak shows slightly same value for others samples indicating that the temperature did not give high influence to other level of defect after 200 °C.

  19. Study of the oxygen and substrate bias effects on the defect structure of reactive sputter-deposited SnOx films

    International Nuclear Information System (INIS)

    Misheva, M.; Nancheva, N.; Docheva, P.; Hadjijska, P.; Djourelov, N.; Elenkov, D.

    1999-01-01

    The effects of oxygen and substrate bias on the defect structure of reactive sputter-deposited SnOx films were investigated. Samples were analysed using transmission electron microscopy (TEM), transmission electron diffraction (TED), X-ray diffraction (XRD) and positron annihilation spectroscopy (PAS). The oxygen played an important role in the film growth and surface morphology. TEM, TED and XRD showed that increasing of the oxygen partial pressure leads to the formation of films with different crystal phases. The void sizes also depended on oxygen partial pressure. The positron lifetimes and their relative intensities depended on the void concentration, the partial annealing of the vacancies and oxidation of SnO to SnOx. This investigation also showed that the mechanical strength of the films obtained at negative substrate bias is higher and the concentration of vacancy defects is smaller, than in the films, prepared without substrate bias. (author)

  20. Particle contamination formation and detection in magnetron sputtering processes

    Energy Technology Data Exchange (ETDEWEB)

    Selwyn, G.S. [Los Alamos National Lab., NM (United States); Weiss, C.A. [Materials Research Corp., Congers, NY (United States). Sputtering Systems Div.; Sequeda, F.; Huang, C. [Seagate Peripherals Disk Div., Milpitas, CA (United States)

    1996-10-01

    Defects caused by particulate contamination are an important concern in the fabrication of thin film products. Often, magnetron sputtering processes are used for this purpose. Particle contamination can cause electrical shorting, pin holes, problems with photolithography, adhesion failure, as well as visual and cosmetic defects. Particle contamination generated during thin film processing can be detected using laser light scattering, a powerful diagnostic technique that provides real-time, {ital in-situ} imaging of particles > 0.3 {mu}m in diameter. Using this technique, the causes, sources and influences on particles in plasma and non-plasma and non-plasma processes may be independently evaluated and corrected. Several studies employing laser light scattering have demonstrated both homogeneous and heterogeneous causes of particle contamination. In this paper, we demonstrate that the mechanisms for particle generation, transport and trapping during magnetron sputter deposition are different from the mechanisms reported in previously studied plasma etch processes. During magnetron sputter deposition, one source of particle contamination is linked to portions of the sputtering target surface exposed to weaker plasma density. In this region, film redeposition is followed by filament or nodule growth and enhanced trapping which increases filament growth. Eventually the filaments effectively ``short circuit`` the sheath, causing high currents to flow through these features. This, in turn, causes heating failure of the filament fracturing and ejecting the filaments into the plasma and onto the substrate. Evidence of this effect has been observed in semiconductor (IC) fabrication and storage disk manufacturing. Discovery of this mechanism in both technologies suggests that this mechanism may be universal to many sputtering processes.

  1. Small sample analysis using sputter atomization/resonance ionization mass spectrometry

    International Nuclear Information System (INIS)

    Christie, W.H.; Goeringer, D.E.

    1986-01-01

    We have used secondary ion mass spectrometry (SIMS) to investigate the emission of ions via argon sputtering from U metal, UO 2 , and U 3 O 8 samples. We have also used laser resonance ionization techniques to study argon-sputtered neutral atoms and molecules emitted from these same samples. For the case of U metal, a significant enhancement in detection sensitivity for U is obtained via SA/RIMS. For U in the fully oxidized form (U 3 O 8 ), SA/RIMS offers no improvement in U detection sensitivity over conventional SIMS when sputtering with argon. 9 refs., 1 fig., 2 tabs

  2. Rapid Simultaneous 17 Elements Analysis of Some Yamato Meteorites by ICP-OES

    OpenAIRE

    Hirano,Masataka; Notsu,Kenji; Onuma,Naoki

    1980-01-01

    Seventeen elements in stone meteorites were determined rapidly and simultaneously by ICP-OES (Inductively Coupled Plasma-Optical Emission Spectroscopy). Five antarctic meteorites were classified by using ICP-OES data. The result is as follows : Yamato-74001 and -75028 are H chondrite and Yamato-74035,-74191 and Allan Hills-769 are L chondrite.

  3. Hydroxyapatite formation on biomedical Ti–Ta–Zr alloys by magnetron sputtering and electrochemical deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Hyun-Ju [Department of Dental Materials, Research Center of Nano-Interface Activation for Biomaterials, and Research Center for Oral Disease Regulation of the Aged, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Jeong, Yong-Hoon [Biomechanics and Tissue Engineering Laboratory, Division of Orthodontics, College of Dentistry, The Ohio State University, Columbus, OH (United States); Choe, Han-Cheol, E-mail: hcchoe@chosun.ac.kr [Department of Dental Materials, Research Center of Nano-Interface Activation for Biomaterials, and Research Center for Oral Disease Regulation of the Aged, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Brantley, William A. [Division of Prosthodontics and Restorative Science, College of Dentistry, The Ohio State University, Columbus, OH (United States)

    2014-12-01

    The purpose of this study was to investigate hydroxyapatite formation on Ti-25Ta-xZr titanium alloys resulting from radio-frequency magnetron sputtering and electrochemical deposition. Electrochemical deposition of hydroxyapatite (HA) was first carried out using a cyclic voltammetry (CV) method at 80 °C in 5 mM Ca (NO{sub 3}){sub 2} + 3 mM NH{sub 4}H{sub 2}PO{sub 4}. Then a physical vapor deposition (PVD) coating was obtained by a radio-frequency (RF) magnetron sputtering technique. The microstructures, phase transformations, and morphologies of the hydroxyapatite films deposited on the titanium alloys were analyzed by optical microscopy (OM), X-ray diffractometer (XRD), energy dispersive X-ray spectroscopy (EDS) and field-emission scanning electron microscopy (FE-SEM). The morphologies of electrochemically deposited HA showed plate-like shapes on the titanium alloys, and the morphologies of the RF-sputtered HA coating had the appearance droplet particles on the plate-like precipitates that had formed by electrochemical deposition. For the RF-sputtered HA coatings, the Ca/P ratio was increased, compared to that for the electrochemically deposited HA surface. Moreover, the RF-sputtered HA coating, consisting of agglomerated droplet particles on the electrochemically deposited HA surface, had better wettability compared to the bulk titanium alloy surface. - Highlights: • Hydroxyapatite (HA) was deposited on Ti–Ta–Zr alloys by radio-frequency (RF) magnetron sputtering and a cyclic voltammetry. • The morphologies of the RF-sputtered HA coating on electrochemical deposits presented plate-like shapes with a droplet particle. • The Ca/P ratio for RF-sputtered HA coatings was greater than that for electrochemical deposited HA coatings. • The RF-sputtered and electrochemical HA coatings had superior wettability compared to the electrochemically deposited coatings.

  4. Contribution to crystallographical and mechanical analysis of molybdenum coatings prepared by magnetron cathode sputtering

    International Nuclear Information System (INIS)

    Bosland, P.

    1989-07-01

    Molybdenum coatings with different compression stresses are obtained by magnetron cathode sputtering by varying negative voltage applied to the substrate during deposition. Stress evolution, crystal texture and argon content are studied [fr

  5. Implantation, recoil implantation, and sputtering

    International Nuclear Information System (INIS)

    Kelly, R.

    1984-01-01

    Underlying ion-beam modification of surfaces is the more basic subject of particle-surface interaction. The ideas can be grouped into forward and backward features, i.e. those affecting the interior of the target and those leading to particle expulsion. Forward effects include the stopping of the incident particles and the deposition of energy, both governed by integral equations which are easily set up but difficult to solve. Closely related is recoil implantation where emphasis is placed not on the stopping of the incident particles but on their interaction with target atoms with resulting implantation of these atoms. Backward effects, all of which are denoted as sputtering, are in general either of collisional, thermal, electronic, or exfoliational origin. (Auth.)

  6. Ion beam sputter implantation method

    International Nuclear Information System (INIS)

    King, W.J.

    1978-01-01

    By means of ion beam atomizing or sputtering an integrally composed coating, the composition of which continuously changes from 100% of the substrate to 100% of the coating, can be surfaced on a substrate (e.g. molten quartz on plastic lenses). In order to do this in the facility there is directed a primary beam of accelerated noble gas ions on a target from the group of the following materials: SiO 2 , Al 2 O 3 , Corning Glass 7070, Corning Glass 7740 or borosilicate glass. The particles leaving the target are directed on the substrate by means of an acceleration potential of up to 10 KV. There may, however, be coated also metal layers (Ni, Co) on a mylar film resulting in a semireflecting metal film. (RW) [de

  7. Sputtering measurements using a quartz crystal microbalance as a catcher

    Science.gov (United States)

    Berger, Bernhard M.; Szabo, Paul S.; Stadlmayr, Reinhard; Aumayr, Friedrich

    2017-09-01

    A quartz crystal microbalance (QCM) catcher setup for sputter yield measurements is described. In this setup a QCM is placed next to the sputter target and acts as a catcher for sputtered material. The sputter yield evaluation relies on assumptions about the angular distribution of sputtered particles and reflected primary projectiles taken from simulations as well as on the knowledge of the sticking coefficient. To test this new setup a second QCM with a Au layer was used as a sputter target. The measured ratio between target and catcher signal is well reproduced in the simulations demonstrating the feasibility of reconstructing the sputtering yield from the catcher signal.

  8. Lithium insertion in sputtered vanadium oxide film

    DEFF Research Database (Denmark)

    West, K.; Zachau-Christiansen, B.; Skaarup, S.V.

    1992-01-01

    Vanadium oxide films have been prepared by RF-sputtering using an oxygen containing sputter ps and a V2O5 target. The main component of these films is orthorhombic V2O5 with poor crystallinity and a tendency for ordering of the crystallites with the c-direction parallel to the substrate. All films...... were oxygen deficient compared to V2O5. Films prepared in pure argon were reduced to V(4) or lower. The vanadium oxide films were tested in solid-state lithium cells. Films sputtered in oxygen showed electrochemical properties similar to crystalline V2O5. The main differences are a decreased capacity...

  9. Sensitivity and stability of sputtered sandwich photocells

    International Nuclear Information System (INIS)

    Murray, H.; Piel, A.

    1979-01-01

    The physical parameters of sputtered Metal-Semiconductor-Metal photocells are described in view of solar energy conversion. Specific properties of sputtered films lead to a particular stability of physical parameters such as dark conduction, capacitance and dielectric losses. Interband transitions occur when the photon energy is larger than the bandgap of the photoconductor. The transport of photo-excited carriers in the built-in electric field involves the existence of a photovoltaic effect. The influence of sputtering on the specific properties of solar energy conversion is discussed. (author)

  10. Fuzzy tungsten in a magnetron sputtering device

    Energy Technology Data Exchange (ETDEWEB)

    Petty, T.J., E-mail: tjpetty@liv.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ (United Kingdom); Khan, A. [Pariser Building-G11, School of Mechanical, Aerospace and Civil Engineering, The University of Manchester, Manchester, M13 9PL (United Kingdom); Heil, T. [NiCaL, Block C Waterhouse Building, 1-3 Brownlow Street, Liverpool, L69 3GL (United Kingdom); Bradley, J.W., E-mail: j.w.bradley@liverpool.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ (United Kingdom)

    2016-11-15

    Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 10{sup 23}–3.0 × 10{sup 24} m{sup −2}, the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 10{sup 24} m{sup −2}, and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ{sup 1/2} relation as opposed to the incubation fluence fit. - Highlights: • Fuzz has been created in a magnetron sputtering device. • Three parameters for fuzz formation have been swept. • A cross-over from pre-fuzz to fully formed fuzz is seen. • Evidence for annealing out at lower temperatures than has been seen before. • Evidence to suggest that fuzz grown in discrete exposures is not consistent with fuzz grown in one long exposure.

  11. Fuzzy tungsten in a magnetron sputtering device

    International Nuclear Information System (INIS)

    Petty, T.J.; Khan, A.; Heil, T.; Bradley, J.W.

    2016-01-01

    Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 10 23 –3.0 × 10 24  m −2 , the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 10 24  m −2 , and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ 1/2 relation as opposed to the incubation fluence fit. - Highlights: • Fuzz has been created in a magnetron sputtering device. • Three parameters for fuzz formation have been swept. • A cross-over from pre-fuzz to fully formed fuzz is seen. • Evidence for annealing out at lower temperatures than has been seen before. • Evidence to suggest that fuzz grown in discrete exposures is not consistent with fuzz grown in one long exposure.

  12. Plasma diagnostic studies of the influence of process variables upon the atomic and molecular species ejected from (1-x)Li4SiO4:xLi3PO4 targets during rf-magnetron sputtering

    International Nuclear Information System (INIS)

    Wachs, A.L.; Bates, J.B.; Dudney, N.J.; Luck, C.F.

    1990-01-01

    The deposition of thin-film electrolytes is a critical step in the development of lithium microbatteries with the potential for circuit integration. We have performed a preliminary study of the rf-magnetron sputtering of (1-x)Li 4 SiO 4 :xLi 3 PO 4 targets used to deposit amorphous thin-film electrolytes formed of the three-component system Li 2 O--SiO 2 --P 2 O 5 . Mass and optical emission spectroscopies have been used to investigate the effects of target composition and the deposition conditions upon the atomic and molecular species ejected from the targets. The data provide important information for understanding the mechanism of film formation and for monitoring the Li atomic flux onto the substrates during film growth. 5 refs., 7 figs., 1 tab

  13. Indigenous development of a glove box for ICP-OES

    International Nuclear Information System (INIS)

    Khan, A.M.; Anwar, M.K.; Bangash, M.A.

    2011-01-01

    Chemical analysis involving nuclear materials are bound to be carried out in safety enclosures like glove box, fume hood etc. whereas chemical analysis which produce mist or vapors of these materials like Atomic absorption Spectrometry, Flame photometry and ICP-AE spectrometry etc. must be performed in a glove box with HEPA filters on exhaust. These instruments with glove box adaptation are rare and impossible to import for our country. An ICP-OES, model Integra-XL of GBC-Australia was purchased in 2008 for chemical analysis of similar materials. As usual it was manufactured to operate in open atmosphere. The required analytical work could not be done in open atmosphere due to active nature of the samples. Therefore modification and glove box (GB) adaptation was required. Although large in size yet difficult to adapt for GB, the instrument had to be modified to a large extent as only sample handling part of the instrument had to placed inside GB, leaving rest of the instrument available for later repair/maintenance work. Different options were considered for modification keeping in mind the isolation and negative pressure inside the GB and maintaining the integrity of the instrument. One of such option was finalized which involved shifting the optic tank etc. A no of isolation gadgets were designed and fabricated locally. This indigenization has saved some handsome amount of foreign exchange. (Author)

  14. The microwave induced plasma with optical emission spectrometry (MIP-OES) in 23 elements determination in geological samples.

    Science.gov (United States)

    Niedzielski, P; Kozak, L; Wachelka, M; Jakubowski, K; Wybieralska, J

    2015-01-01

    The article presents the optimisation, validation and application of the microwave induced plasma optical emission spectrometry (MIP-OES) dedicated for a routine determination of Ag, Al, B, Ba, Bi, Ca, Cd, Cr, Cu, Fe, Ga, In, K, Li, Mg, Mn, Mo, Na, Ni, Pb, Sr, Tl, Zn, in the geological samples. The three procedures of sample preparation has been proposed: sample digestion with the use of hydrofluoric acid for determination of total concentration of elements, extraction by aqua regia for determination of the quasi-total element concentration and extraction by hydrochloric acid solution to determine contents of the elements in acid leachable fraction. The detection limits were on the level 0.001-0.121 mg L(-1) (from 0.010-0.10 to 1.2-12 mg kg(-1) depend on the samples preparation procedure); the precision: 0.20-1.37%; accuracy 85-115% (for recovery for certified standards materials analysis and parallel analysis by independent analytical techniques: X-ray fluorescence (XRF) and flame absorption spectrometry (FAAS)). The conformity of the results obtained by MIP-OES analytical procedures with the results obtained by XRF and FAAS analysis allows to propose the procedures for studies of elemental composition of the fraction of the geological samples. Additionally, the MIP-OES technique is much less expensive than ICP techniques and much less time-consuming than AAS techniques. Copyright © 2014 Elsevier B.V. All rights reserved.

  15. Comparison of NAA XRF and ICP-OES Methods on Analysis of Heavy Metals in Coals and Combustion Residues

    Directory of Open Access Journals (Sweden)

    Agus Taftazani

    2017-07-01

    Full Text Available Heavy metals in the samples of coals and combustion residues (bottom ash and fly ash from Pacitan coal-fired power plant (CPP have been identified by using NAA, XRF, and ICP-OES methods. This research was aimed to understand the analysis results correlation coefficient (R and determine the enrichment ratio (ER value of the samples by using three analysis methods. The results showed 10 elements have been simultaneously detected in all samples. The correlation coefficient of analysis results of metals content in coals by using NAA-XRF, XRF-ICP OES and with ICPOES-NAA methods gives R2£1 respectively. The correlation coefficient of analysis results of metals content in bottom ash and fly ash by using the methods of NAA-XRF, XRF-ICPOES, and ICPOES-NAA gained R2»1 respectively. ICP-OES method was most satisfactory in this study. The value of ER for identified metals by using the three methods in the samples of bottom ash and fly ash yielded the value over one, and ER value of fly ash was greater in comparison to the bottom ash.

  16. Ab initio calculations and experimental study of piezoelectric YxIn1−xN thin films deposited using reactive magnetron sputter epitaxy

    International Nuclear Information System (INIS)

    Tholander, C.; Birch, J.; Tasnádi, F.; Hultman, L.; Palisaitis, J.; Persson, P.O.Å.; Jensen, J.; Sandström, P.; Alling, B.; Žukauskaitė, A.

    2016-01-01

    By combining theoretical prediction and experimental verification we investigate the piezoelectric properties of yttrium indium nitride (Y x In 1−x N). Ab initio calculations show that the Y x In 1−x N wurtzite phase is lowest in energy among relevant alloy structures for 0≤x≤0.5. Reactive magnetron sputter epitaxy was used to prepare thin films with Y content up to x=0.51. The composition dependence of the lattice parameters observed in the grown films is in agreement with that predicted by the theoretical calculations confirming the possibility to synthesize a wurtzite solid solution. An AlN buffer layer greatly improves the crystalline quality and surface morphology of subsequently grown Y x In 1−x N films. The piezoelectric response in films with x=0.09 and x=0.14 is observed using piezoresponse force microscopy. Theoretical calculations of the piezoelectric properties predict Y x In 1−x N to have comparable piezoelectric properties to Sc x Al 1−x N.

  17. Investigation of the annealing effects on the structural and optoelectronic properties of RF-sputtered ZnO films studied by the Drude-Lorentz model

    Science.gov (United States)

    García-Méndez, Manuel; Bedoya-Calle, Álvaro; Segura, Ricardo Rangel; Coello, Víctor

    2015-09-01

    Zinc oxide films were deposited on glass substrates by RF reactive magnetron sputtering and post-annealed in vacuum at 100, 200, and 300 ºC. Structural and optical properties of films were obtained using X-ray diffraction and UV-visible spectroscopy. Optical parameters were extracted from transmittance curves using the single-oscillator Drude-Lorentz model. The evolution of the optical and structural properties of films with the annealing process was investigated. The films crystallized into the hexagonal würzite lattice structure, with preferential growth along the c-axis [0002]. The results indicate that the crystalline quality of films improved with annealing, whereas transparency was reduced from 90 to 80 % at 300 ºC. With post-annealing, the absorption edge shifted to the red, while the optical band gap decreased from to eV because of the Burstein-Moss effect. Calculated values of plasma frequency, fall within the IR range and decrease with temperature, from rad/s () to rad/s ().

  18. High resolution x-ray diffraction study of the substrate temperature and thickness dependent microstructure of reactively sputtered epitaxial ZnO films

    KAUST Repository

    Singh, Devendra

    2017-08-24

    Epitaxial ZnO films were grown on c-sapphire by reactive sputtering of zinc target in Ar-O2 mixture. High resolution X-ray diffraction measurements were carried out to obtain lateral and vertical coherence lengths, crystallite tilt and twist, micro-strain and densities of screw and edge dislocations in epilayers of different thickness (25 - 200 nm) and those grown at different temperatures (100 - 500 °C). phgr-scans indicate epitaxial growth in all the cases, although epilayers grown at lower substrate temperatures (100 °C and 200 °C) and those of smaller thickness (25 nm and 50 nm) display inferior microstructural parameters. This is attributed to the dominant presence of initially grown strained 2D layer and subsequent transition to an energetically favorable mode. With increase in substrate temperature, the transition shifts to lower thickness and growth takes place through the formation of 2D platelets with intermediate strain, over which 3D islands grow. Consequently, 100 nm thick epilayers grown at 300 °C display the best microstructural parameters (micro-strain ~1.2 x 10-3, screw and edge dislocation densities ~1.5 x 1010 cm-2 and ~2.3 x 1011 cm-2, respectively). A marginal degradation of microstructural parameters is seen in epilayers grown at higher substrate temperatures, due to the dominance of 3D hillock type growth.

  19. Ion Beam Analysis, structure and corrosion studies of nc-TiN/a-Si3N4 nanocomposite coatings deposited by sputtering on AISI 316L

    International Nuclear Information System (INIS)

    García, J.; Canto, C.E.; Flores, M.; Andrade, E.; Rodríguez, E.; Jiménez, O.; Solis, C.; Lucio, O.G. de; Rocha, M.F.

    2014-01-01

    In this work, nanocomposite coatings of nc-TiN/a-Si 3 N 4 , were deposited on AISI 316L stainless steel substrate by a DC and RF reactive magnetron co-sputtering technique using an Ar–N 2 plasma. The structure of the coatings was characterized by means of XRD (X-ray Diffraction). The substrate and coating corrosion resistance were evaluated by potentiodynamic polarization using a Ringer solution as electrolyte. Corrosion tests were conducted with the purpose to evaluate the potential of this coating to be used on biomedical alloys. IBA (Ion Beam Analysis) techniques were applied to measure the elemental composition profiles of the films and, XPS (X-ray Photoelectron Spectroscopy) were used as a complementary technique to obtain information about the compounds present in the films. The nanocomposite coatings of nc-TiN/a-Si 3 N 4 show crystalline (TiN) and amorphous (Si 3 N 4 ) phases which confer a better protection against the corrosion effects compared with that of the AISI 316L

  20. Electrochromism of sputtered tungstic oxide films

    International Nuclear Information System (INIS)

    Tatsuoka, Hirokazu; Urabe, Kazuo; Kitao, Michihiko; Yamada, Shoji

    1985-01-01

    Electrochromism of tungstic oxide films were investigated. The films were prerared by r.f. sputtering from compressed WO 3 target under various total pressure and O 2 content of Ar-O 2 mixed sputtering atmosphere. Blue films were obtained under low total pressure of sputtering atmosphere with low content of O 2 . These films could be colored more deeply by the conventional electrochemical procedure, but could not be bleached to transparent states. Transparent films were obtained under the condition of high total pressure or high O 2 content of sputtering atmosphere. The transparent films prepared under high pressure show good electrochromic behavior after aging process. During the aging process, ''passive protons'' are injected into WO 3 matrix, where the ''passive proton'' means that it has no influence on electrochromic absorption band, and is not able to be extracted electrochemically. (author)

  1. Electrical resistivity of sputtered molybdenum films

    International Nuclear Information System (INIS)

    Nagano, J.

    1980-01-01

    The electrical resistivity of r.f. sputtered molybdenum films of thickness 5-150 nm deposited on oxidized silicon substrates was resolved into the three electron scattering components: isotropic background scattering, scattering at grain boundaries and scattering at surfaces. It was concluded that the isotropic background scattering is almost equal to that of bulk molybdenum and is not influenced by sputtering and annealing conditions. When the film thickness is sufficient that surface scattering can be ignored, the decrease in film resistivity after annealing is caused by the decrease in scattering at the grain boundaries for zero bias sputtered films, and is caused by an increase of the grain diameter for r.f. bias sputtered films. (Auth.)

  2. Sputtering yield measurements on single crystal cobalt

    International Nuclear Information System (INIS)

    Chernysh, V.S.; Johansen, A.; Sarholt-Kristensen, L.

    1981-01-01

    Single crystals of cobalt have been bombarded with 80 keV A + ions in the direction of the h.c.p. structure and in the direction of the f.c.c. structure. The sputtering yields, measured by the weight loss method, depend on the crystal structure, and damage, introduced by the ion bombardment, is shown to play a significant role in the explanation of the measured sputtering yields. (Auth.)

  3. A long-term validation of the modernised DC-ARC-OES solid-sample method

    Energy Technology Data Exchange (ETDEWEB)

    Florian, K. [Dept. of Chemistry, Technical University of Kosice (Slovakia); Hassler, J.; Foerster, O. [Elektroschmelzwerk GmbH, Kempten (Germany)

    2001-12-01

    The validation procedure based on ISO 17 025 standard has been used to study and illustrate both the long-term stability of the calibration process of the DC-ARC solid sample spectrometric method and the main validation criteria of the method. In the calculation of the validation characteristics depending on the linearity(calibration), also the fulfilment of predetermining criteria such as normality and homoscedasticity was checked. In order to decide whether there are any trends in the time-variation of the analytical signal or not, also the Neumann test of trend was applied and evaluated. Finally, a comparison with similar validation data of the ETV-ICP-OES method was carried out. (orig.)

  4. Additive manufactured Ti6Al4V scaffolds with the RF- magnetron sputter deposited hydroxyapatite coating

    International Nuclear Information System (INIS)

    Chudinova, E; Surmeneva, M; Surmenev, R; Koptioug, A; Scoglund, P

    2016-01-01

    Present paper reports on the results of surface modification of the additively manufactured porous Ti6Al4V scaffolds. Radio frequency (RF) magnetron sputtering was used to modify the surface of the alloy via deposition of the biocompatible hydroxyapatite (HA) coating. The surface morphology, chemical and phase composition of the HA-coated alloy were studied. It was revealed that RF magnetron sputtering allows preparing a homogeneous HA coating onto the entire surface of scaffolds. (paper)

  5. Plasma analysis of inductively coupled impulse sputtering of Cu, Ti and Ni

    Science.gov (United States)

    Loch, D. A. L.; Aranda Gonzalvo, Y.; Ehiasarian, A. P.

    2017-06-01

    Inductively coupled impulse sputtering (ICIS) is a new development in the field of highly ionised pulsed PVD processes. For ICIS the plasma is generated by an internal inductive coil, replacing the need for a magnetron. To understand the plasma properties, measurements of the current and voltage waveforms at the cathode were conducted. The ion energy distribution functions (IEDFs) were measured by energy resolved MS and plasma chemistry was analysed by OES and then compared to a model. The target was operated in pulsed DC mode and the coil was energised by pulsed RF power, with a duty cycle of 7.5%. At a constant pressure (14 Pa) the set peak RF power was varied from 1000-4000 W. The DC voltage to the target was kept constant at 1900 V. OES measurements have shown a monotonic increase in intensity with increasing power. Excitation and ionisation processes were single step for ICIS of Ti and Ni and multi-step for Cu. The latter exhibited an unexpectedly steep rise in ionisation efficiency with power. The IEDFs measured by MS show the material- and time-dependant plasma potential in the range of 10-30 eV, ideal for increased surface mobility without inducing lattice defects. A lower intensity peak, of high energetic ions, is visible at 170 eV during the pulse.

  6. Dependance of sputtering yield on incident angle for ion beam

    Energy Technology Data Exchange (ETDEWEB)

    Tanizaki, Hironori; Ooba, Hikaru; Masuhara, Kenichi

    1987-07-01

    The relationship between sputtering yeild (S/sub theta/) and the incident angle (theta) of an ion beam to some metals such as Fe, Ni, Zn and SUS304, was studied by Ion Micro Analyzer (IMA). It was confirmed that S/sub theta/ varied as a function of (costheta)/sup -f/. The value of f was differed with each sample, and ranged from 1.0 to 1.5 in this study. As theta increased, the surface roughness of the sputtered samples became greater, and the depth resolution of the depth profile became worse. It is necessary to pay attention to depth resolution, when various data concerning different incident angles are compared.

  7. Fabrication and characterization of sputtered-carbon microelectrode arrays.

    Science.gov (United States)

    Sreenivas, G; Ang, S S; Fritsch, I; Brown, W D; Gerhardt, G A; Woodward, D J

    1996-06-01

    This paper describes a robust and reliable process for fabricating a novel sputter-deposited, thin-film carbon microelectrode array using standard integrated circuit technologies and silicon micromachining. Sputter-deposited carbon films were investigated as potential candidates for microelectrode materials. The surface properties and cross section of the microelectrode arrays were studied by atomic force microscopy and scanning electron microscopy, respectively. Electrical site impedance, crosstalk, and lifetime (dielectric integrity) of microelectrodes in the array were characterized. Electrochemical response of the microelectrodes to hexaammineruthenium(III) chloride and dopamine were investigated by fast-scan cyclic voltammetry and high-speed, computer-based chronoamperometry; results show that thin-film carbon microelectrodes are well-behaved electrochemically. The thin carbon films offer extremely good electrical, mechanical, and chemical properties and thus qualify as viable candidates for various electroanalytical applications, particularly acute neurophysiological studies.

  8. PIXE as a complement to ICP-OES trace metal analysis in Sudanese medicinal plants.

    Science.gov (United States)

    Mubark Ebrahim, Ammar; Etayeb, M A; Khalid, H; Noun, Manale; Roumie, M; Michalke, B

    2014-08-01

    This paper compares trace element concentrations (Ca, K, Sr, Fe, Mn, Zn, Ni, Cu, Co and Cr) in 27 Sudanese medical plants determined in parallel by PIXE and ICP-OES to get information on which technique is preferable at different matrices and element concentrations. PIXE correlates well to ICP-OES for Sr, Mn, Ca, K, Zn and Fe determinations. ICP-OES seems to be the superior technique over PIXE when measuring low concentrated elements (chromium, cobalt, nickel and copper) in the medicinal plants. Copyright © 2014 Elsevier Ltd. All rights reserved.

  9. Study of uranium dioxyde sputtering induced by multicharged heavy ions at low and very low kinetic energy: projectile charge effect; Etude de la pulverisation du dioxyde d'uranium induite par des ions lourds multicharges de basse et tres basse energie cinetique; effet de la charge du projectile

    Energy Technology Data Exchange (ETDEWEB)

    Haranger, F

    2003-12-01

    Ion beam irradiation of a solid can lead to the emission of neutral or ionized atoms, molecules or clusters from the surface. This comes as a result of the atomic motion in the vicinity of the surface, induced by the transfer of the projectile energy. Then, the study of the sputtering process appears as a means to get a better understanding of the excited matter state around the projectile trajectory. In the case of slow multicharged ions, a strong electronic excitation can be achieved by the projectile neutralization above the solid surface and / or its deexcitation below the surface. Parallel to this, the slowing down of such ions is essentially related to elastic collision with the target atoms. The study of the effect of the initial charge state of slow multicharged ions, in the sputtering process, has been carried out by measuring the absolute angular distributions of emission of uranium atoms from a uranium dioxide surface. The experiments have been performed in two steps. First, the emitted particles are collected onto a substrate during irradiation. Secondly, the surface of the collectors is analyzed by Rutherford Backscattering Spectrometry (RBS). This method allows the characterization of the emission of neutrals, which are the vast majority of the sputtered particles. The results obtained provide an access to the evolution of the sputtering process as a function of xenon projectile ions charge state. The measurements have been performed over a wide kinetic energy range, from 81 down to 1.5 keV. This allowed a clear separation of the contribution of the kinetic energy and initial projectile charge state to the sputtering phenomenon. (author)

  10. Sequential sputtered Co-HfO{sub 2} granular films

    Energy Technology Data Exchange (ETDEWEB)

    Chadha, M.; Ng, V.

    2017-03-15

    A systematic study of magnetic, magneto-transport and micro-structural properties of Co-HfO{sub 2} granular films fabricated by sequential sputtering is presented. We demonstrate reduction in ferromagnetic-oxide formation by using HfO{sub 2} as the insulting matrix. Microstructure evaluation of the films showed that the film structure consisted of discrete hcp-Co grains embedded in HfO{sub 2} matrix. Films with varying compositions were prepared and their macroscopic properties were studied. We correlate the variation in these properties to the variation in film microstructure. Our study shows that Co-HfO{sub 2} films with reduced cobalt oxide and varying properties can be prepared using sequential sputtering technique. - Highlights: • Co-HfO{sub 2} granular films were prepared using sequential sputtering. • A reduction in ferromagnetic-oxide formation is observed. • Co-HfO{sub 2} films display superparamagnetism and tunnelling magneto-resistance. • Varying macroscopic properties were achieved by changing film composition. • Applications can be found in moderate MR sensors and high –frequency RF devices.

  11. Cone formation on copper by ion-beam sputtering

    International Nuclear Information System (INIS)

    Den, A.K.; Ghose, D.

    1991-01-01

    The phenomenon of cone formation on solid surfaces by ion-beam sputtering has been the subject of extensive studies in recent years. The reason for this is that not only do such studies provide a better understanding of the physical processes underlying the cone formation, they also show the importance and relevance of ion-induced textured surfaces in different technologies and experimental techniques. Usually cones are formed by impurity contamination of the target surface during sputtering. In the absence of impurities, a particular target crystallography can result in a high density of cone formation. In the present work the formation and morphologies of cones were studied on a Cu substrate by seeding W-impurities during Kr + -ion sputtering. The results showed that the surface was eroded unevenly and several regions of densely populated cones were formed. The simultaneous appearance of short and tall cones apparently supports both the left-standing and the growth models of cone formation. The cone apex angle was measured and also theoretically predicted. The discrepancy between the two values is possibly due to the neglect of so-called secondary effects. (author)

  12. Computer simulation of sputtering of graphite target in magnetron sputtering device with two zones of erosion

    Directory of Open Access Journals (Sweden)

    Bogdanov R.V.

    2015-03-01

    Full Text Available A computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.

  13. Effect of argon ion sputtering of surface on hydrogen permeation through vanadium

    International Nuclear Information System (INIS)

    Yamawaki, Michio; Namba, Takashi; Yoneoka, Toshiaki; Kanno, Masayoshi; Shida, Koji.

    1983-01-01

    In order to measure the hydrogen permeation rate through V with atomically cleaned surface, an Ar ion sputtering apparatus has been installed in the hydrogen permeability measuring system. The permeation rate of the initial specimen was found to be increased by about one order of magnitude after Ar ion sputtering of its upstream side surface. Repeating of such a sputter-cleaning was not so much effective in increasing the steady state permeation rate as the initial sputtering was, but it accelerated the transient response rate by a factor of 2 or 3. The transient response rate was also accelerated by the increase of hydrogen pressure, but this effect tended to be diminished by the sputter-cleaning of specimen surface. The surface impurity layer on the downstream side of specimen was also inferred to act as a diffusion barrier affecting the steady state permeation rate. The present value of activation energy for hydrogen permeation through V at temperatures below 873K was the smallest one ever obtained, showing that the surface effect was minimized in the present study on account of the surface sputter-cleaning in addition to the ultra high vacuum system. (author)

  14. Influence of a Revolutionary Substrate on Hysteresis Effect in Reactive Sputtering Deposition of Vanadium Oxide

    Directory of Open Access Journals (Sweden)

    He YU

    2016-05-01

    Full Text Available Reactive sputter processes frequently exhibit stability problems. The cause of this is that these processes normally exhibit hysteresis effects in the processing curves. Eliminating or decreasing the hysteresis would significantly simplify the use of reactive sputtering processes. In this work, we present reactive sputtering deposition modeling of vanadium oxide with a revolutionary substrate, aiming to study the influence of it on hysteresis effect. Based on this modeling, the fractions of V, V2O3, VO2, V2O5 at the target surface and target voltage have been investigated as a function of reactive gas flow during the reactive sputtering. The substrate area was replaced by a new parameter of effective area of substrate As which was calculated as a sum of contributions from the substrate area at each cell of time. From the modeling results, it is suggested that the effective area of the substrate was reduced for reactive sputtering with revolutionary substrate, thus the hysteresis width would be decreased. This has been experimentally verified by reactive sputtering deposition of VOx. Besides, the fundamental explanation to this behavior as well as the experimental verification is presented.DOI: http://dx.doi.org/10.5755/j01.ms.22.1.7569

  15. Effects of local texture and grain structure on the sputtering performance of tantalum

    Energy Technology Data Exchange (ETDEWEB)

    Michaluk, C.A. [Cabot Performance Metals, Boyertown, PA (United States); Field, D.P.; Nibur, K.A. [Washington State Univ., Pullman, WA (United States); Wright, S.I.; Witt, R.A. [EDX/TSL, Draper, UT (United States)

    2002-07-01

    Tantalum and tantalum-based thin films have gained precedence as the diffusion barrier for copper interconnects used in the latest generation of integrated circuits (ICs). The paper presents insight and observations on the covariance of texture and grain size of wrought tantalum sputtering targets and their influence on sputtering performance. Previous studies involving deposition trials of tantalum targets of varying metallurgical character had demonstrated that both grain size and textural homogeneity is critical for assuring reliable sputtering performance of tantalum. Subsequently, a model had been proposed to prescribe how localized texture bands and orientation clusters in tantalum are effectively resistant to sputter erosion. In this paper, results of atomic force microscopy (AFM) and orientation imaging microscopy (OIM{sup TM}) analyses on the eroded surface of a tantalum sputtering target are presented. Initial findings support the model's hypothesis regarding the erosion mechanics of crystallites with respect to grain size and discrete orientation. However, additional work is necessary to understand the formation and erosion of facet planes in polycrystalline tantalum sputtering targets. (orig.)

  16. Arc generation from sputtering plasma-dielectric inclusion interactions

    CERN Document Server

    Wickersham, C E J; Fan, J S

    2002-01-01

    Arcing during sputter deposition and etching is a significant cause of particle defect generation during device fabrication. In this article we report on the effect of aluminum oxide inclusion size, shape, and orientation on the propensity for arcing during sputtering of aluminum targets. The size, shape, and orientation of a dielectric inclusion plays a major role in determining the propensity for arcing and macroparticle emission. In previous studies we found that there is a critical inclusion size required for arcing to occur. In this article we used high-speed videos, electric arc detection, and measurements of particle defect density on wafers to study the effect of Al sub 2 O sub 3 inclusion size, shape, and orientation on arc rate, intensity, and silicon wafer particle defect density. We found that the cross-sectional area of the inclusion exposed to the sputtering plasma is the critical parameter that determines the arc rate and rate of macroparticle emission. Analysis of the arc rate, particle defect...

  17. Actinide Sputtering Induced by Fission with Ultra-cold Neutrons

    Science.gov (United States)

    Shi, Tan; Venuti, Michael; Fellers, Deion; Martin, Sean; Morris, Chris; Makela, Mark

    2017-09-01

    Understanding the effects of actinide sputtering due to nuclear fission is important for a wide range of applications, including nuclear fuel storage, space science, and national defense. A new program at the Los Alamos Neutron Science Center uses ultracold neutrons (UCN) to induce fission in actinides such as uranium and plutonium. By controlling the UCN energy, it is possible to induce fission at the sample surface within a well-defined depth. It is therefore an ideal tool for studying the effects of fission-induced sputtering as a function of interaction depth. Since the mechanism for fission-induced surface damage is not well understood, this work has the potential to deconvolve the various damage mechanisms. During the irradiation with UCN, NaI detectors are used to monitor the fission events and were calibrated by monitoring fission fragments with an organic scintillator. Alpha spectroscopy of the ejected actinide material is performed in an ion chamber to determine the amount of sputtered material. Actinide samples with various sample properties and surface conditions are irradiated and analyzed. In this talk, I will discuss our experimental setup and present the preliminary results from the testing of multiple samples. This work has been supported by Los Alamos National Laboratory and Seaborg Summer Research Fellowship.

  18. Sputtering properties of tungsten 'fuzzy' surfaces

    International Nuclear Information System (INIS)

    Nishijima, D.; Baldwin, M.J.; Doerner, R.P.; Yu, J.H.

    2011-01-01

    Sputtering yields of He-induced W 'fuzzy' surfaces bombarded by Ar have been measured in the linear divertor plasma simulator PISCES-B. It is found that the sputtering yield of a fuzzy surface, Y fuzzy , decreases with increasing fuzzy layer thickness, L, and saturates at ∼10% of that of a smooth surface, Y smooth , at L > 1 μm. The reduction in the sputtering yield is suspected to be due mainly to the porous structure of fuzz, since the ratio, Y fuzzy /Y smooth follows (1 - p fuzz ), where p fuzz is the fuzz porosity. Further, Y fuzzy /Y smooth is observed to increase with incident ion energy, E i . This may be explained by an energy dependent change in the angular distribution of sputtered W atoms, since at lower E i , the angular distribution is observed to become more butterfly-shaped. That is, a larger fraction of sputtered W atoms can line-of-sight deposit/stick onto neighboring fuzz nanostructures for lower E i butterfly distributions, resulting in lower ratio of Y fuzzy /Y smooth .

  19. Effect of sputtering power on structural and optical properties of radio frequency-sputtered In2S3 thin films.

    Science.gov (United States)

    Hwang, Dong Hyun; Cho, Shinho; Hui, Kwun Nam; Son, Young Guk

    2014-12-01

    In this study, we investigated the structural and optical properties of indium sulfide (In2S3) thin films as a substitute for the CdS buffer layer in Cu(In,Ga)Se2 (CIGS) solar cells. The In2S3 films were deposited on glass substrates using radio frequency (RF) magnetron sputtering. The sputtering power was changed from 60 to 120 W in 20 W increments. The effects of sputtering power on the crystallinity, surface morphology, and optical properties of the films were characterized with X-ray diffraction (XRD), atomic force microscopy (AFM), energy dispersive X-ray spectroscopy (EDS), and UV-visible spectrophotometry. The XRD analyses indicated that the films were polycrystalline β-In2S3 structures with two preferred orientations along the (103) and (206) directions. The AFM images revealed that the films had nanosized grains and that the size increased from 7 nm for the samples prepared at 60 W to 13 nm for those prepared at 120 W. The optical band gap of the samples was found to vary between 2.88 and 2.43 eV.

  20. Collimated Magnetron Sputter Deposition for Mirror Coatings

    DEFF Research Database (Denmark)

    Vickery, A.; Cooper-Jensen, Carsten P.; Christensen, Finn Erland

    2008-01-01

    At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence that a collimat......At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence...... that a collimation of the sputtered particles is an efficient way to suppress the interfacial roughness of the produced multilayer. We present two different types of collimation optimized for the production of low roughness curved mirrors and flat mirrors, respectively....

  1. Quantitative sputter profiling at surfaces and interfaces

    International Nuclear Information System (INIS)

    Kirschner, J.; Etzkorn, H.W.

    1981-01-01

    The key problem in quantitative sputter profiling, that of a sliding depth scale has been solved by combined Auger/X-ray microanalysis. By means of this technique and for the model system Ge/Si (amorphous) the following questions are treated quantitatively: shape of the sputter profiles when sputtering through an interface and origin of their asymmetry; precise location of the interface plane on the depth profile; broadening effects due to limited depth of information and their correction; origin and amount of bombardment induced broadening for different primary ions and energies; depth dependence of the broadening, and basic limits to depth resolution. Comparisons are made to recent theoretical calculations based on recoil mixing in the collision cascade and very good agreement is found

  2. Sputtering as a means of depth profiling

    International Nuclear Information System (INIS)

    Whitton, J.L.

    1978-01-01

    Probably the most common technique for determination of depth profiles by sputtering is that of secondary ion mass spectrometry. Many problems occur in the important step of converting the time (of sputtering) scale to a depth scale and these problems arise before the secondary ions are ejected. An attempt is made to present a comprehensive list of the effects that should be taken into consideration in the use of sputtering as a means of depth profiling. The various parameters liable to affect the depth profile measurements are listed in four sections: beam conditions; target conditions; experimental environment; and beam-target interactions. The effects are discussed and where interplay occurs, cross-reference is made and examples are provided where possible. (B.R.H.)

  3. Thick beryllium coatings by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Wu, H; Nikroo, A; Youngblood, K; Moreno, K; Wu, D; Fuller, T; Alford, C; Hayes, J; Detor, A; Wong, M; Hamza, A; van Buuren, T; Chason, E

    2011-04-14

    Thick (>150 {micro}m) beryllium coatings are studied as an ablator material of interest for fusion fuel capsules for the National Ignition Facility (NIF). As an added complication, the coatings are deposited on mm-scale spherical substrates, as opposed to flats. DC magnetron sputtering is used because of the relative controllability of the processing temperature and energy of the deposits. We used ultra small angle x-ray spectroscopy (USAXS) to characterize the void fraction and distribution along the spherical surface. We investigated the void structure using a combination focused ion beam (FIB) and scanning electron microscope (SEM), along with transmission electron microscopy (TEM). Our results show a few volume percent of voids and a typical void diameter of less than two hundred nanometers. Understanding how the stresses in the deposited material develop with thickness is important so that we can minimize film cracking and delamination. To that end, an in-situ multiple optical beam stress sensor (MOSS) was used to measure the stress behavior of thick Beryllium coatings on flat substrates as the material was being deposited. We will show how the film stress saturates with thickness and changes with pressure.

  4. Properties of gold nanostructures sputtered on glass

    Directory of Open Access Journals (Sweden)

    Kolská Zdeňka

    2011-01-01

    Full Text Available Abstract We studied the electrical and optical properties, density, and crystalline structure of Au nanostructures prepared by direct current sputtering on glass. We measured temperature dependence of sheet resistance and current-voltage characteristics and also performed scanning electron microscopy [SEM] analysis of gold nanolayers. It was shown that within the wide range of temperatures, gold nanolayers (<10 nm exhibit both metal and semiconducting-like type of conductivity. UV/Vis analysis proved the semiconducting characteristic of intrinsic Au clusters. SEM analysis showed the initiatory stadium of gold layer formation to be running over isolated islands. Gold density calculated from the weight and effective thickness of the layers is an increasing function of the layer thickness up to approximately 100 nm. In thin layers deposited on solid surface, a lattice expansion is observed, which is manifested in the increase of the lattice parameter and the decrease of metal density. With increasing layer thickness, the lattice parameter and the density approach the bulk values.

  5. Comparative study of structural and electro-optical properties of ZnO:Ga films grown by steered cathodic arc plasma evaporation and sputtering on plastic and their application on polymer-based organic solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Liang, Chih-Hao, E-mail: dataman888@hotmail.com [R& D Division, Walsin Technology Corporation, Kaohsiung, Taiwan (China); Hsiao, Yu-Jen [National Nano Device Laboratories, National Applied Research Laboratories, Tainan, Taiwan (China); Hwang, Weng-Sing [Department of Materials Science and Engineering, National Cheng Kung University, Tainan, Taiwan (China)

    2016-08-01

    ). • Comparative study of the performance of GZO films grown by steered CAPE and sputtering • Films grown by CAPE show greater crystallite size and lower stacking fault density. • Films grown by steered CAPE show low resistivity and high transparency. • The performance of organic solar cells was improved by using CAPE-grown GZO electrodes.

  6. Photonometers for coating and sputtering machines

    Science.gov (United States)

    Oupický, P.; Jareš, D.; Václavík, J.; Vápenka, D.

    2013-04-01

    The concept of photonometers (alternative name of optical monitor of a vacuum deposition process) for coating and sputtering machines is based on photonometers produced by companies like SATIS or HV Dresden. Photometers were developed in the TOPTEC centre and its predecessor VOD (Optical Development Workshop of Institut of Plasma Physics AS CR) for more than 10 years. The article describes current status of the technology and ideas which will be incorporated in next development steps. Hardware and software used on coating machines B63D, VNA600 and sputtering machine UPM810 is presented.

  7. Sputtering erosion of fusion reactor cavity walls

    International Nuclear Information System (INIS)

    Bohachevsky, I.O.; Hafer, J.F.

    1976-12-01

    Devised are functions that describe the empirically and theoretically determined behavior of sputtering coefficients. These functions are used in a computer program that calculates erosion rates and total erosion of surfaces bombarded by ion beams of specified intensity. Presented here are analytic expressions that describe the effects of ion energy and angle of incidence, computational procedures, and results. Results, computed for alpha, triton, deuteron, and heavy-metal ions bombarding niobium, carbon, and iron surfaces indicate that for pellets with heavy metal shell structures sputtering erosion should be carefully considered and properly designed for

  8. Dependence of sputtering coefficient on ion dose

    International Nuclear Information System (INIS)

    Colligon, J.S.; Patel, M.H.

    1977-01-01

    The sputtering coefficient of polycrystalline gold bombarded by 10-40 keV Ar + ions had been measured as a function of total ion dose and shown to exhibit oscillations in magnitude between 30 and 100%. Possible experimental errors which would give rise to such an oscillation have been considered, but it is apparent that these factors are unable to explain the measurements. It is proposed that a change in the Sublimation Energy associated with either bulk damage or formation of surface topographical features arising during ion bombardment may be responsible for the observed variations in sputtering coefficient. (author)

  9. Sputtering yield calculation for binary target

    International Nuclear Information System (INIS)

    Jimenez-Rodriguez, J.J.; Rodriguez-Vidal, M.; Valles-Abarca, J.A.

    1979-01-01

    The generalization for binary targets, of the ideas proposed by Sigmund for monoatomic targets, leads to a set of coupled intergrodifferential equations for the sputtering functions. After moment decomposition, the final formulae are obtained by the standard method based on the Laplace Transform, where the inverse transform is made with the aid of asymptotic expansions in the limit of very high projectile energy as compared to the surface binding energy. The possible loss of stoichiometry for binary targets is analyzed. Comparison of computed values of sputtering yield for normal incidence, with experimental results shows good agreement. (author)

  10. Sputtering target made by hot isostatic compaction

    International Nuclear Information System (INIS)

    Wright, R.J.; Hecht, R.J.; Fenton, R.J.

    1979-01-01

    In a method of making a cooled sputtering target assembly, material to be sputtered is in powder form which is isostatically hot-pressed in a toroidal metallic container under conditions which promote compaction and bonding of the powder particles to form a dense material. Parts of the container are then removed from the target material except for a remnant around the outer surface of the target material. A cooling jacket is then fabricated and attached around the remnant of the container. The targets specified are made from MCrAlY type alloys where M is Fe, Co or Ni. (U.K.)

  11. Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation.

    Science.gov (United States)

    Schroeder, J L; Thomson, W; Howard, B; Schell, N; Näslund, L-Å; Rogström, L; Johansson-Jõesaar, M P; Ghafoor, N; Odén, M; Nothnagel, E; Shepard, A; Greer, J; Birch, J

    2015-09-01

    We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and cathodic arc deposition system purposefully designed for time-resolved in situ thin film deposition/annealing studies using high-energy (>50 keV), high photon flux (>10(12) ph/s) synchrotron radiation. The high photon flux, combined with a fast-acquisition-time (<1 s) two-dimensional (2D) detector, permits time-resolved in situ structural analysis of thin film formation processes. The high-energy synchrotron-radiation based x-rays result in small scattering angles (<11°), allowing large areas of reciprocal space to be imaged with a 2D detector. The system has been designed for use on the 1-tonne, ultra-high load, high-resolution hexapod at the P07 High Energy Materials Science beamline at PETRA III at the Deutsches Elektronen-Synchrotron in Hamburg, Germany. The deposition system includes standard features of a typical UHV deposition system plus a range of special features suited for synchrotron radiation studies and industry-relevant processes. We openly encourage the materials research community to contact us for collaborative opportunities using this unique and versatile scientific instrument.

  12. Involvement of NpdA, a Putative 2-Nitropropane Dioxygenase, in the T3SS Expression and Full Virulence inRalstonia solanacearumOE1-1.

    Science.gov (United States)

    Zhang, Weiqi; Li, Jing; Tang, Yu; Chen, Kai; Shi, Xiaojun; Ohnishi, Kouhei; Zhang, Yong

    2017-01-01

    Previously, we isolated several genes that potentially affected the expression of type III secretion system (T3SS) in Ralstonia solanacearum OE1-1. Here, we focused on the rsp0316 , which encodes a putative 2-nitropropane dioxygenase (hereafter designated NpdA). The deletion of npdA substantially reduced the T3SS expression and virulence in OE1-1, and the complementation with functional NpdA could completely restore its reduced T3SS expression and virulence to that of wild type. The NpdA was highly conserved among diverse R. solanacearum species and the NpdA-dependent expression of T3SS was not specific to OE1-1 strain, but not the virulence. The NpdA was important for the T3SS expression in planta , while it was not required for the bacterial growth in planta . Moreover, the NpdA was not required for the elicitation of hypersensitive response (HR) of R. solanacearum strains in tobacco leaves. The T3SS in R. solanacearum is directly controlled by the AraC-type transcriptional regulator HrpB and regulated by a complex regulation network. The NpdA affected the T3SS expression mediated with HrpB but through some novel pathway. All these results from genetic studies demonstrate that NpdA is a novel factor for the T3SS expression in diverse R. solanacearum species in medium, but specifically for the T3SS expression in strain OE1-1 in planta . And the NpdA-dependent expression of T3SS in planta plays an important role in pathogenicity of R. solanacearum OE1-1 in host plants.

  13. Aluminum oxide sputtering: a new approach to understanding the sputtering process for binary targets

    International Nuclear Information System (INIS)

    Finn, P.A.; Gruen, D.M.; Page, D.L.

    1976-01-01

    The relative abundances of the products Al, Al 2 O, and AlO sputtered in 15- and 40-kV Ar + and 15-kV H + bombardments of aluminum oxide targets (anodized film, polycrystalline disk, sapphire) are functions of the target material and of the nature, flux, and fluence of the ion beam. This finding suggests that, in collisional sputtering, the material's sensitive parameters are the surface binding energies of the sputtered species. These energies are functions of the surface composition present at the moment of a particular sputtering event and should be identified with the partial molar enthalpy of vaporization of a particular species. The aluminum oxide species--Al, Al 2 O, AlO, Al 2 O 2 , AlO 2 , Al(O 2 ) 2 , and AlO 3 --are characterized by matrix isolation spectroscopy aided by O 18 isotopic substitution experiments. 12 figures, 4 tables

  14. Synergistic sputtering properties of binary alloys

    International Nuclear Information System (INIS)

    Krauss, A.R.; DeWald, A.B.; Gruen, D.M.; Lam, N.Q.

    1984-01-01

    We have found that dilute concentrations of lithium in copper produce surfaces which are nearly pure lithium when heated and subject to irradiation. In order to better understand the experimental results, we have modeled the Cu-Li system using a modified version of the TRIM computer code and an alloy segregation program developed by N.Q. Lam. The TRIM code calculates the sputtering yield and depth of origin of the sputtered atoms for materials in which the composition varies from one atomic layer to the next and the segregation program uses these sputtering yields to trace the evolution of the concentration profile. The initial result of sputtering is to preferentially deplete the surface species. Continued irradiation, however, creates a subsurface region of high displacement damage. In the Cu-Li alloy, lithium moves very rapidly through this region, resulting in subsurface lithium enrichment. The enriched region broadens and eventually reaches the surface. The exact effect on the lithium concentration in the first two atomic layers depends on the temperature, damage profile, and particle flux. Results of the calculation are presented, along with a discussion of their implications for fusion reactor materials

  15. Morphology of ion-sputtered surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Makeev, Maxim A. E-mail: makeev@baton.phys.lsu.edu; Cuerno, Rodolfo; Barabasi, Albert-Laszlo

    2002-12-01

    We derive a stochastic nonlinear continuum equation to describe the morphological evolution of amorphous surfaces eroded by ion bombardment. Starting from Sigmund's theory of sputter erosion, we calculate the coefficients appearing in the continuum equation in terms of the physical parameters characterizing the sputtering process. We analyze the morphological features predicted by the continuum theory, comparing them with the experimentally reported morphologies. We show that for short time scales, where the effect of nonlinear terms is negligible, the continuum theory predicts ripple formation. We demonstrate that in addition to relaxation by thermal surface diffusion, the sputtering process can also contribute to the smoothing mechanisms shaping the surface morphology. We explicitly calculate an effective surface diffusion constant characterizing this smoothing effect and show that it is responsible for the low temperature ripple formation observed in various experiments. At long time scales the nonlinear terms dominate the evolution of the surface morphology. The nonlinear terms lead to the stabilization of the ripple wavelength and we show that, depending on the experimental parameters, such as angle of incidence and ion energy, different morphologies can be observed: asymptotically, sputter eroded surfaces could undergo kinetic roughening, or can display novel ordered structures with rotated ripples. Finally, we discuss in detail the existing experimental support for the proposed theory and uncover novel features of the surface morphology and evolution, that could be directly tested experimentally.

  16. Sputtering of Surfaces of the Solid Hydrogens

    DEFF Research Database (Denmark)

    Schou, Jørgen; Thestrup Nielsen, Birgitte; Svendsen, Winnie Edith

    1998-01-01

    Sputtering of the solid hydrogens by electrons and ions exhibits features that may be related to quantum properties of these solids, i.e. a drastic enhancement of the yield for electron–bombarded thick deuterium films and a thermal peak at low ejection energies in the energy distribution...

  17. Pulsed dc self-sustained magnetron sputtering

    International Nuclear Information System (INIS)

    Wiatrowski, A.; Posadowski, W. M.; Radzimski, Z. J.

    2008-01-01

    The magnetron sputtering has become one of the commonly used techniques for industrial deposition of thin films and coatings due to its simplicity and reliability. At standard magnetron sputtering conditions (argon pressure of ∼0.5 Pa) inert gas particles (necessary to sustain discharge) are often entrapped in the deposited films. Inert gas contamination can be eliminated during the self-sustained magnetron sputtering (SSS) process, where the presence of the inert gas is not a necessary requirement. Moreover the SSS process that is possible due to the high degree of ionization of the sputtered material also gives a unique condition during the transport of sputtered particles to the substrate. So far it has been shown that the self-sustained mode of magnetron operation can be obtained using dc powering (dc-SSS) only. The main disadvantage of the dc-SSS process is its instability related to random arc formation. In such case the discharge has to be temporarily extinguished to prevent damaging both the magnetron source and power supply. The authors postulate that pulsed powering could protect the SSS process against arcs, similarly to reactive pulsed magnetron deposition processes of insulating thin films. To put this concept into practice, (i) the high enough plasma density has to be achieved and (ii) the type of pulsed powering has to be chosen taking plasma dynamics into account. In this article results of pulsed dc self-sustained magnetron sputtering (pulsed dc-SSS) are presented. The planar magnetron equipped with a 50 mm diameter and 6 mm thick copper target was used during the experiments. The maximum target power was about 11 kW, which corresponded to the target power density of ∼560 W/cm 2 . The magnetron operation was investigated as a function of pulse frequency (20-100 kHz) and pulse duty factor (50%-90%). The discharge (argon) extinction pressure level was determined for these conditions. The plasma emission spectra (400-410 nm range) and deposition

  18. Morphology and Structure of ZnO Films Synthesized by Off-Axis Sputtering Deposition

    Science.gov (United States)

    Zhu, Shen; Su, C.-H.; Lehoczky, S. L.

    1999-01-01

    ZnO is a wide-band-gap oxide material that has many applications. A new potential application of ZnO material is for light emitting devices since its structure and electrical properties are similar to that of the GaN material (a blue laser candidate). It also is a good substrate for fabricating GaN-based devices. Off-axis sputtering technique has revealed great potential in synthesizing excellent oxide materials because the negative ion bombardment is greatly reduced when adatoms condense on substrates. The surface of films grown by off-axis sputtering will be much smoother than that produced in a regular sputtering configuration. A growth mechanism is studied by investigating the morphology and structure of ZnO films under different growth conditions and orientations. ZnO films are deposited on (0001) sapphire and quartz substrates by off- axis sputtering deposition at various oxygen/argon mixture ratios and pressures and at different temperatures. All films reveal highly textured structures on quartz substrates and epitaxial growth on sapphire substrates. Two off-axis configurations, vertical and horizontal orientations are conducted to study the process of film growth, surface morphology, and film structure. X-ray diffraction, scanning probe microscopy, and electrical measurements are used to characterize these films. Detailed results will be discussed in the presentation. Keywords: ZnO, Photonic material, Off-axis sputtering, Growth mechanism

  19. Observing Planets and Small Bodies in Sputtered High Energy Atom (SHEA) Fluxes

    Science.gov (United States)

    Milillo, A.; Orsini, S.; Hsieh, K. C.; Baragiola, R.; Fama, M.; Johnson, R.; Mura, A.; Plainaki, Ch.; Sarantos, M.; Cassidy, T. A.; hide

    2012-01-01

    The evolution of the surfaces of bodies unprotected by either strong magnetic fields or thick atmospheres in the Solar System is caused by various processes, induced by photons, energetic ions and micrometeoroids. Among these processes, the continuous bombardment of the solar wind or energetic magnetospheric ions onto the bodies may significantly affect their surfaces, with implications for their evolution. Ion precipitation produces neutral atom releases into the exosphere through ion sputtering, with velocity distribution extending well above the particle escape limits. We refer to this component of the surface ejecta as sputtered high-energy atoms (SHEA). The use of ion sputtering emission for studying the interaction of exposed bodies (EB) with ion environments is described here. Remote sensing in SHEA in the vicinity of EB can provide mapping of the bodies exposed to ion sputtering action with temporal and mass resolution. This paper speculates on the possibility of performing remote sensing of exposed bodies using SHEA The evolution of the surfaces of bodies unprotected by either strong magnetic fields or thick atmospheres in the Solar System is caused by various processes, induced by photons, energetic ions and micrometeoroids. Among these processes, the continuous bombardment of the solar wind or energetic magnetospheric ions onto the bodies may significantly affect their surfaces, with implications for their evolution. Ion precipitation produces neutral atom releases into the exosphere through ion sputtering, with velocity distribution extending well above the particle escape limits. We refer to this component of the surface ejecta as sputtered high-energy atoms (SHEA). The use of ion sputtering emission for studying the interaction of exposed bodies (EB) with ion environments is described here. Remote sensing in SHEA in the vicinity of EB can provide mapping of the bodies exposed to ion sputtering action with temporal and mass resolution. This paper

  20. Topography evolution in sputtered stratified media and in spatio-time variable ion flux conditions

    Energy Technology Data Exchange (ETDEWEB)

    Carter, G.; Nobes, M.J.; Lewis, G.W.; Cox, J.

    Earlier theoretical studies on the development of topography on solids sputtered by spatially uniform and spatially non-uniform ion fluxes are extended to a general treatment including spatially non-uniform (e.g. stratified) solids and time varying ion fluxes. It is shown that the former case is relevant to the sputter erosion of, for example, polycrystalline media, dislocated solids and surface contaminant protection situations. Predictions of feature development in these three cases is shown to correspond very well with experimental studies, and offers convincing explanation of the different etch pit elaboration processes, associated with dislocations, depending upon incident ion beam and rotated target situations and the relevance of the theory to practical situations of (1) substrate thinning and polishing and (2) controlled surface contour evolution are outlined. Some simulation studies with sand blasting, which is, in many ways, a macroscopic analogue of ion bombardment sputter erosion are presented also.

  1. Contamination by sputtering in mirror field electron cyclotron resonance microwave ion plasma

    International Nuclear Information System (INIS)

    Gorbatikin, S.M.; Berry, L.A.

    1992-01-01

    Langmuir probe measurements, visual observation, and Rutherford backscattering spectrometry (RBS) have been used to investigate source chamber sputtering for electron cyclotron resonance (ECR) plasma systems operated with Ar, N 2 , and Cl 2 . Potentials in the source > 20eV combined with high plasma densities (>10 12 cm -3 ) led to source chamber sputtering and coating of the microwave entrance window. During Ar operation, the microwave entrance window coating caused significant absorption of incident microwave power and decreased source efficiency by as much as 40% in 11 cm 2 sec -1 . Cl 2 , operation did not result in microwave entrance window coating, however surface contamination from sputtering was detected. Operation of the source with an anodized aluminum liner was effective in reducing microwave entrance window coating but resulted in some heavy metal contamination due to sputtering of impurities in the liner itself. Also, checks with secondary ion mass spectrometry (SIMS) indicated some Al contamination from sputtering of the anodized aluminum liner material. Finally, a technique for in situ cleaning of the microwave entrance window was developed and expedited source contamination studies

  2. Angular distribution of sputtered atoms from Al-Sn alloy and surface topography

    International Nuclear Information System (INIS)

    Wang Zhenxia; Pan Jisheng; Zhang Jiping; Tao Zhenlan

    1992-01-01

    If an alloy is sputtered the angular distribution of the sputtered atoms can be different for each component. At high ion energies in the range of linear cascade theory, different energy distributions for components of different mass in the solid are predicted. Upon leaving the surface, i.e. overcoming the surface binding energy, these differences should show up in different angular distributions. Differences in the angular distribution are of much practical interest, for example, in thin-film deposition by sputtering and surface analysis by secondary-ion mass spectroscopy and Auger electron spectroscopy. Recently our experimental work has shown that for Fe-W alloy the surface microtopography becomes dominant and determines the shape of the angular distribution of the component. However, with the few experimental results available so far it is too early to draw any general conclusions for the angular distribution of the sputtered constituents. Thus, the aim of this work was to study further the influence of the surface topography on the shape of the angular distribution of sputtered atoms from an Al-Sn alloy. (Author)

  3. Isotopic Enrichment of Boron in the Sputtering of Boron Nitride with Xenon Ions

    Science.gov (United States)

    Ray, P. K.; Shutthanandan, V.

    1998-01-01

    An experimental study is described to measure the isotopic enrichment of boron. Xenon ions from 100 eV to 1.5 keV were used to sputter a boron nitride target. An ion gun was used to generate the ion beam. The ion current density at the target surface was approximately 30 microA/sq cm. Xenon ions impinged on the target surface at 50 deg angle to the surface normal. Since boron nitride is an insulator, a flood electron gun was used in our experiments to neutralize the positive charge buildup on the target surface. The sputtered secondary ions of boron were detected by a quadrupole mass spectrometer. The spectrometer entrance aperture was located perpendicular to the ion beam direction and 10 mm away from the target surface. The secondary ion flux was observed to be enriched in the heavy isotopes at lower ion energies. The proportion of heavy isotopes in the sputtered secondary ion flux was found to decrease with increasing primary ion energy from 100 to 350 eV. Beyond 350 eV, light isotopes were sputtered preferentially. The light isotope enrichment factor was observed to reach an asymptotic value of 1.27 at 1.5 keV. This trend is similar to that of the isotopic enrichment observed earlier when copper was sputtered with xenon ions in the same energy range.

  4. Dependence of energy per molecule on sputtering yields with reactive gas cluster ions

    International Nuclear Information System (INIS)

    Toyoda, Noriaki; Yamada, Isao

    2010-01-01

    Gas cluster ions show dense energy deposition on a target surface, which result in the enhancement of chemical reactions. In reactive sputtering with gas cluster ions, the energy per atom or molecule plays an important role. In this study, the average cluster size (N, the number of atoms or molecules in a cluster ion) was controlled; thereby the dependences of the energy per molecule on the sputtering yields of carbon by CO 2 cluster ions and that of Si by SF 6 /Ar mixed gas cluster ions were investigated. Large CO 2 cluster ions with energy per molecule of 1 eV showed high reactive sputtering yield of an amorphous carbon film. However, these ions did not cause the formation of large craters on a graphite surface. It is possible to achieve very low damage etching by controlling the energy per molecule of reactive cluster ions. Further, in the case of SF 6 /Ar mixed cluster ions, it was found that reactive sputtering was enhanced when a small amount of SF 6 gas (∼10%) was mixed with Ar. The reactive sputtering yield of Si by one SF 6 molecule linearly increased with the energy per molecule.

  5. Major and trace elements assessment in sediment from Ituparanga reservoir, by activation analysis and ICP OES

    Energy Technology Data Exchange (ETDEWEB)

    Silva, Sharlleny A., E-mail: sharllenya@cetesbnet.sp.gov.br [Companhia de Tecnologia de Saneamento Ambiental (CETESB), Sao Paulo, SP (Brazil). Lab. de Quimica Inorganica; Bevilacqua, Jose Eduardo [Companhia de Tecnologia de Saneamento Ambiental (CETESB), Sao Paulo, SP (Brazil). Diretoria de Tecnologia, Qualidade e Avaliacao Ambiental; Favaro, Deborah I.T., E-mail: defavaro@ipen.br [Instituto de Pesquisas Energeticas e Nucleares (IPEN/CNEN-SP), Sao Paulo, SP (Brazil). Lab. de Analise por Ativacao Neutronica

    2011-07-01

    The Ituparanga reservoir was built to generate electric power by the LIGHT Company and started its operation in 1912. It is fed by the Una, Sorocamirim and Sorocabucu rivers. This reservoir supplies water to a population of 600.000. This water system is affected by irregular soil occupation and urban development which has caught CETESB's (Environmental Company of Sao Paulo State) attention. In this study four geo-referenced sampling points were used and bottom sediment samples were collected. The sediment samples were dried at 400 deg C, ground in an agate mortar, sieved (200 mesh) and again homogenized. The instrumental neutron activation analysis was applied to the sediment samples in order to determine some major elements (Fe, K and Na), trace (As, Ba, Br, Co, Cr, Cs, Hf, Rb, Sb, Sc, Ta, Tb, Th, U and Zn) and rare earth (Ce, Eu, La, Lu, Nd, Sm, Tb and Yb) elements. By using ICP OES metals determination for Cd, Cr, Cu, Pb and Ni was undertaken after digestion procedure according to the 3051 method from US EPA. The methodology validation for precision and accuracy was carried out by reference material analyses. For metals Cd, Cr, Cu, Pb and Ni the concentration values were compared to the oriented values from Environmental Canada (TEL and PEL). The Enrichment Factor (EF) was calculated for sediment contamination assessment. (author)

  6. Spectrophotometric analysis of crown discoloration induced by MTA- and ZnOE-based sealers

    Science.gov (United States)

    IOANNIDIS, Konstantinos; MISTAKIDIS, Ilias; BELTES, Panagiotis; KARAGIANNIS, Vassilis

    2013-01-01

    Crown discoloration can be induced by root canal sealer remnants following root canal treatment. Objective: The aim of this study was to evaluate chromatic alterations in human tooth crowns induced by a Mineral Trioxide Aggregate-based sealer (MTA Fillapex® and a commonly used ZnOE-based sealer (Roth-811). The tested null hypothesis was that the application of the materials did not induce clinically perceptible crown discoloration (Ho: CIE color difference ΔECIE L*a*b* color system and the corresponding ΔE values were calculated. Statistical analysis was performed using two-way mixed ANOVA models, at p=0.05 level of significance. Results: A statistically significant increase in a* and b* chromatic parameters of the MTA Fillapex Group was measured. However, ΔE values did not exceed the human eye perceptibility threshold (set at ΔE<3.7) during the experimental period (ΔEt3=2.88). In Roth-811 Group, a statistically significant decrease in L* and a statistically significant increase in a* and b* chromatic parameters was measured, during all observation periods. Resultant ΔE values exceeded the human eye perceptibility threshold after 1 week (ΔEt1=5.65). Conclusions: Application of MTA Fillapex in tooth crowns resulted in minimal color alterations, while Roth 811 induced severe discoloration, in vitro. It could be suggested that, in terms of aesthetics, the use of MTA Fillapex appears to be favorable. PMID:23739854

  7. Postoperative survival following perioperative MAGIC versus neoadjuvant OE02-type chemotherapy in oesophageal adenocarcinoma.

    Science.gov (United States)

    Reece-Smith, A M; Saunders, J H; Soomro, I N; Bowman, C R; Duffy, J P; Kaye, P V; Welch, N T; Madhusudan, S; Parsons, S L

    2017-05-01

    The optimal management of resectable oesophageal adenocarcinoma is controversial, with many centres using neoadjuvant chemotherapy following the Medical Research Council (MRC) oesophageal working group (OE02) trial and the MRC Adjuvant Gastric Infusional Chemotherapy (MAGIC) trial. The more intensive MAGIC regimen is used primarily in gastric cancer but some also use it for oesophageal cancer. A database of cancer resections (2001-2013) provided information on survival of patients following either OE02 or MAGIC-type treatment. The data were compared using Kaplan-Meier analysis. Straight-to-surgery patients were also reviewed and divided into an 'early' cohort (2001-2006, OE02 era) and a 'late' cohort (2006-2013, MAGIC era) to estimate changes in survival over time. Subgroup analysis was performed for responders (tumour regression grade [TRG] 1-3) versus non-responders (TRG 4 and 5) and for anatomical site (gastro-oesophageal junction [GOJ] vs oesophagus). An OE02 regimen was used for 97 patients and 275 received a MAGIC regimen. Those in the MAGIC group were of a similar age to those undergoing OE02 chemotherapy but the proportion of oesophageal cancers was higher among MAGIC patients than among those receiving OE02 treatment. MAGIC patients had a significantly lower stage following chemotherapy than OE02 patients and a higher median overall survival although TRG was similar. On subgroup analysis, this survival benefit was maintained for GOJ and oesophageal cancer patients as well as non-responders. Analysis of responders showed no difference between regimens. 'Late' group straight-to-surgery patients were significantly older than those in the 'early' group. Survival, however, was not significantly different for these two cohorts. Although the original MAGIC trial comprised few oesophageal cancer cases, our patients had better survival with MAGIC than with OE02 chemotherapy in all anatomical subgroups, even though there was no significant change in operative

  8. Power Production Analysis of the OE Buoy WEC for the CORES Project

    DEFF Research Database (Denmark)

    Lavelle, John; Kofoed, Jens Peter

    which a total of 39 hours of power production data was collected. A data acquisition system was used to sample the sensors on board and the generator shaft power time-series data was used in the analysis here. A wave-rider buoy, located at the site of OE Buoy and operated by the Marine Institute Ireland......, was used to determine the wave statistics for the sea conditions which coincided with the OE Buoy device data, in order to estimate the efficiency of the device as a function of the sea state (for example as a function of the mean zero down period, Tz, and, significant wave height, Hs) as described below...

  9. Optimum design of reactive sputtering parameters on the mechanical and photocatalytic properties of C-doped TiO2 films

    NARCIS (Netherlands)

    Wei, Bo; Li, H.G.; Wen, Feng; Pei, Yutao T.

    2017-01-01

    TiO2 is widely studied for its good photocatalysis activity. In this research, CO2 gas was used as carbon and oxygen source to prepare carbon-doped TiO2 (C-TiO2) films on stainless steel using reactive magnetron sputtering. In order to grasp the relationship between sputtering process,

  10. Determination of rare earth elements in geological samples by Icp-OES followed by ion exchange separation (abstract)

    International Nuclear Information System (INIS)

    Ahmad, S.

    2011-01-01

    Present study was carried out to develop a procedure for the chemical separation of rare earth elements (Rees) from major matrix elements using the cation exchange resin column and their quantitative determination by Icp-Oes. The standard reference samples with different concentrations of rare earth elements were prepared using analytical grade standards of rare earth elements (La, Ce, Pr, Nd, Eu, Sm, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sc, Y) and major matrix elements (Al, B, Ca, Cd, Co, Cr, Cu, Fe, Mg, Mn, Ni, Pb, Si) in 1n HCl media. Sample solutions were passed through pre equilibrated strongly acidic cation-exchange resin (Dowex 50w X 8). Major matrix elements were eluted with 2n HCl And HNO/sub 3/ whereas Rees (La, Co, Pr, Nd, Eu, Sm, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sc, Y) were eluted from the resin using 6 To 8n HNO/sub 3/. The proposed method separates the Rees quantitatively from most matrix constituents and greatly facilitates their rapid sequential analysis by ICP-OES. The results revealed usefulness of method for the 95-100% recovery of Rees and their determination up to 0.1 mu g/Ml in solutions of rare earth ores and other geological materials. (author)

  11. [Analysis and Evaluation of Inorganic Elements in Euryale Semen from Different Habitats by Microwave Digestion-ICP-OES].

    Science.gov (United States)

    Wang, Hong; Wu, Qi-nan; Wu, Cheng-ying; Fan, Xiu-he; Jiang, Zheng; Gu, Wei; Yue, Wei

    2015-01-01

    To establish a simple, rapid and efficient method for determination of different inorganic elements in Euryale Semen from different habitats. Inductively coupled plasma-optical emission spectrometry(ICP-OES) was applied to determine inorganic elements in Euryale Semen, and the results were analyzed by principal component analysis. Euryale Semen from different habitats contained the kind of inorganic elements ranging from 22 to 26, including micronutrient elements like Iron, Zinc, Selenium, Copper, Molybdenum, Chrome and Cobalt, as well as macronutrient elements such as Potassium, Calcium, Sodium, Magnesium and Phosphorus. Five factors were extracted and used to comprehensively evaluate Euryale Semen from 20 different habitats covered almost China. The comprehensive function was F = 0. 38828F1 + 0. 25603F2 + 0. 07617F3 + 0. 06860F4 + 0. 04868F5, which resulted in the top three samples coming from Jiangsu Gaoyou, Hunan Xiangxi and Jiangsu Suzhou respectively. The study indicates that ICP-OES is a quick, accurate and sensitive method to determine the contents of inorganic elements in Euryale Semen,which provides scientific and reliable reference for its quality control and safety assessment.

  12. Production of Zr-89 using sputtered yttrium coin targets 89Zr using sputtered yttrium coin targets.

    Science.gov (United States)

    Queern, Stacy Lee; Aweda, Tolulope Aramide; Massicano, Adriana Vidal Fernandes; Clanton, Nicholas Ashby; El Sayed, Retta; Sader, Jayden Andrew; Zyuzin, Alexander; Lapi, Suzanne Elizabeth

    2017-07-01

    An increasing interest in zirconium-89 ( 89 Zr) can be attributed to the isotope's half-life which is compatible with antibody imaging using positron emission tomography (PET). The goal of this work was to develop an efficient means of production for 89 Zr that provides this isotope with high radionuclidic purity and specific activity. We investigated the irradiation of yttrium sputtered niobium coins and compared the yields and separation efficiency to solid yttrium coins. The sputtered coins were irradiated with an incident beam energy of 17.5MeV or 17.8MeV providing a degraded transmitted energy through an aluminum degrader of 12.5MeV or 12.8MeV, respectively, with various currents to determine optimal cyclotron conditions for 89 Zr production. Dissolution of the solid yttrium coin took 2h with 50mL of 2M HCl and dissolution of the sputtered coin took 15-30min with 4mL of 2M HCl. During the separation of 89 Zr from the solid yttrium coins, 77.9 ± 11.2% of the activity was eluted off in an average of 7.3mL of 1M oxalic acid whereas for the sputtered coins, 91 ± 6% was eluted off in an average of 1.2mL of 1M oxalic acid with 100% radionuclidic purity. The effective specific activity determined via DFO-SCN titration from the sputtered coins was 108±7mCi/μmol as compared to 20.3mCi/μmol for the solid yttrium coin production. ICP-MS analysis of the yttrium coin and the sputtered coins showed 99.99% yttrium removed with 178μg of yttrium in the final solution and 99.93-100% of yttrium removed with remaining range of 0-42μg of yttrium in the final solution, respectively. The specific activity calculated for the solid coin and 3 different sputtered coins using the concentration of Zr found via ICP-MS was 140±2mCi/μmol, 300±30mCi/μmol, 410±60mCi/μmol and 1719±5mCi/μmol, respectively. Labeling yields of the 89 Zr produced via sputtered targets for 89 Zr- DFO-trastuzumab were >98%. Overall, these results show the irradiation of yttrium sputtered niobium coins

  13. Tuning the optoelectronic properties of amorphous MoOx films by reactive sputtering

    DEFF Research Database (Denmark)

    Fernandes Cauduro, André Luis; Fabrim, Zacarias Eduardo; Ahmadpour, Mehrad

    2015-01-01

    In this letter, we report on the effect of oxygen partial pressure and sputtering power on amorphous DC-sputtered MoOx films. We observe abrupt changes in the optoelectronic properties of the reported films by increasing the oxygen partial pressure from 1.00 ? 10?3 mbar to 1.37 ? 10?3 mbar during...... significantly the microstructure of the studied films. The presence of states within the band gap due to the lack of oxygen is the most probable mechanism for generat- ing a change in electrical conductivity as well as optical absorption in DC-sputtered MoOx. The large tuning range of the optoelectronic...... properties in these films holds strong promise for their implementation in optoelectronic devices....

  14. Preparation and Characterization of FC Films Coated on PET Substrates by RF Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Huang Mei-lin

    2018-01-01

    Full Text Available Fluorocarbon (FC films were prepared on polyethylene terephthalate (PET plates and PET fabrics respectively by a radiofrequency (RF magnetron sputtering technique using polytetrafluoroethylene (PTFE as a target. Scanning electron microscope and X-ray photoelectron spectroscopy were used to investigate the morphology, structure and composition of the obtained FC films. The hydrophobicity and uvioresistant properties of the FC film coated fabric were studied. The results show that the FC films were successfully deposited on the PET substrates by a RF magnetron sputtering. The deposited films are made up of four components -CF3, -CF2-, CF- and -C-. The proportions of the four components and surface morphologies of the deposited films vary with the sputtering conditions. Compared with the original fabric samples, the hydrophobicity of the FC film coated fabrics is quite good and improved significantly.

  15. Transport theory of sputtering I: Depth of origin of sputtered atoms

    International Nuclear Information System (INIS)

    Zhang, Z.L.

    1999-01-01

    Sputter theory employing a sum of two power cross sections has been implemented. Compared with the well known Lindhard power cross section (V∝r -1/m ), a sum of two such cross sections can give a much better approximation to the Born-Mayer scattering in the low energy region (m ∼ 0.1). By using both one and two power cross sections, we have solved the linear transport equations describing the sputtering problem asymptotically. As usual, electronic stopping is ignored in the analysis. It has further been proved that Falcone's theory of the atom ejection process contradicts transport theory. The Andersen-Sigmund relation for partial sputtering yield ratios between two elements in an arbitrary multicomponent target has been derived by both methods. The energy deposited in the target surface layers has been computed for a few typical ion-target combinations. The numerical curves show that both theories generate almost the same results (error <10%) for m=3D0.2. It is also shown that, if the sputtering yield equals the corresponding one in Sigmund's theory, the depth of origin of sputtered atoms must be shorter than in Sigmund's theory for 0.25 m ≥ 3D 0. The former even may be only about one half of the latter as long as m=3D0. (Copyright (c) 1998 Elsevier Science B.V., Amsterdam. All rights reserved.)

  16. Pumping behavior of sputter ion pumps

    International Nuclear Information System (INIS)

    Chou, T.S.; McCafferty, D.

    The ultrahigh vacuum requirements of ISABELLE is obtained by distributed pumping stations. Each pumping station consists of 1000 l/s titanium sublimation pump for active gases (N 2 , H 2 , O 2 , CO, etc.), and a 20 l/s sputter ion pump for inert gases (methane, noble gases like He, etc.). The combination of the alarming production rate of methane from titanium sublimation pumps (TSP) and the decreasing pumping speed of sputter ion pumps (SIP) in the ultrahigh vacuum region (UHV) leads us to investigate this problem. In this paper, we first describe the essential physics and chemistry of the SIP in a very clean condition, followed by a discussion of our measuring techniques. Finally measured methane, argon and helium pumping speeds are presented for three different ion pumps in the range of 10 -6 to 10 -11 Torr. The virtues of the best pump are also discussed

  17. Origins of Beta Tantalum in Sputtered Coatings

    National Research Council Canada - National Science Library

    Mulligan, C

    2001-01-01

    .... Some of the most recent work has attempted to relate the energetics (i.e., atom/ion energy) of the plasma to the alpha right arrow beta transition. It has been shown that the energetics of the plasma can relate to the most crucial sputtering parameters. The most significant feature of the use of plasma energy to explain the alpha right arrow beta transition is that it relates the formation of beta-tantalum to a quantifiable measure.

  18. Sputter coating of microspherical substrates by levitation

    Science.gov (United States)

    Lowe, A.T.; Hosford, C.D.

    Microspheres are substantially uniformly coated with metals or nonmetals by simltaneously levitating them and sputter coating them at total chamber pressures less than 1 torr. A collimated hole structure comprising a parallel array of upwardly projecting individual gas outlets is machined out to form a dimple. Glass microballoons,, which are particularly useful in laser fusion applications, can be substantially uniformly coated using the coating method and apparatus.

  19. Particle-balance models for pulsed sputtering magnetrons

    Science.gov (United States)

    Huo, Chunqing; Lundin, D.; Gudmundsson, J. T.; Raadu, M. A.; Bradley, J. W.; Brenning, N.

    2017-09-01

    The time-dependent plasma discharge ionization region model (IRM) has been under continuous development during the past decade and used in several studies of the ionization region of high-power impulse magnetron sputtering (HiPIMS) discharges. In the present work, a complete description of the most recent version of the IRM is given, which includes improvements, such as allowing for returning of the working gas atoms from the target, a separate treatment of hot secondary electrons, addition of doubly charged metal ions, etc. To show the general applicability of the IRM, two different HiPIMS discharges are investigated. The first set concerns 400 μs long discharge pulses applied to an Al target in an Ar atmosphere at 1.8 Pa. The second set focuses on 100 μs long discharge pulses applied to a Ti target in an Ar atmosphere at 0.54 Pa, and explores the effects of varying the magnetic field strength. The model results show that Al2+ -ions contribute negligibly to the production of secondary electrons, while Ti2+ -ions effectively contribute to the production of secondary electrons. Similarly, the model results show that for an argon discharge with Al target the contribution of Al+-ions to the discharge current at the target surface is over 90% at 800 V. However, at 400 V the Al+-ions and Ar+-ions contribute roughly equally to the discharge current in the initial peak, while in the plateau region Ar+-ions contribute to roughly \\frac{2}{3} of the current. For high currents the discharge with Al target develops almost pure self-sputter recycling, while the discharge with Ti target exhibits close to a 50/50 combination of self-sputter recycling and working gas-recycling. For a Ti target, a self-sputter yield significantly below unity makes working gas-recycling necessary at high currents. For the discharge with Ti target, a decrease in the B-field strength, resulted in a corresponding stepwise increase in the discharge resistivity.

  20. Carbon sputtering yield measurements at grazing incidence

    International Nuclear Information System (INIS)

    Kolasinski, Robert D.; Polk, James E.; Goebel, Dan; Johnson, Lee K.

    2008-01-01

    In this investigation, carbon sputtering yields were measured experimentally at varying angles of incidence under Xe + bombardment. The measurements were obtained by etching a coated quartz crystal microbalance (QCM) with a low energy ion beam. The material properties of the carbon targets were characterized with a scanning electron microscope (SEM) and Raman spectroscopy. C sputtering yields measured under Ar + and Xe + bombardment at normal incidence displayed satisfactory agreement with previously published data over an energy range of 200 eV-1 keV. For Xe + ions, the dependence of the yields on angle of incidence θ was determined for 0 o ≤ θ ≤ 80 deg. Over this range, an increase in C sputtering yield by a factor of 4.8 was observed, with the peak in yield occurring at 70 o . This is a much higher variation compared to Xe + → Mo yields under similar conditions, a difference that may be attributed to higher scattering of the incident particles transverse to the beam direction than in the case of Xe + → C. In addition, the variation of the yields with θ was not strongly energy dependent. Trapping of Xe in the surface was observed, in contrast to observations using the QCM technique with metallic target materials. Finally, target surface roughness was characterized using atomic force microscope measurements to distinguish between the effects of local and overall angle of incidence of the target

  1. Sputtering ultra-small Pt on nanographitic flakes deposited by electrophoresis for ethanol electro oxidation

    Science.gov (United States)

    Daryakenari, Ahmad Ahmadi; Daryakenari, Mohammad Ahmadi; Omidvar, Hamid

    2018-01-01

    To acquire highly efficient and cost-effective fuel cells, numerous research works have been carried out to the development low cost and excellent performance of electrocatalysts. In this paper, a solution-based electrophoretic deposition (EPD) technique for fabrication of Pt-based catalyst layers is studied. Nanographitic flake coatings used as catalyst support for sputtered platinium (Pt) were fabricated via the electrophoretic deposition (EPD) of dispersed nanographitic flakes in isopropyl alcohol. Magnesium nitrate hexahydrate (MNH) was used as an additive binder in the EPD process. Subsequently, the platinium particles were deposited by a direct sputtering on the fabricated nanographitic flake coatings.

  2. [Development of ICP-OES, ICP-MS and GF-AAS Methods for Simultaneous Quantification of Lead, Total Arsenic and Cadmium in Soft Drinks].

    Science.gov (United States)

    Kataoka, Yohei; Watanabe, Takahiro; Hayashi, Tomoko; Teshima, Reiko; Matsuda, Rieko

    2015-01-01

    In this study, we developed methods to quantify lead, total arsenic and cadmium contained in various kinds of soft drinks, and we evaluated their performance. The samples were digested by common methods to prepare solutions for measurement by ICP-OES, ICP-MS and graphite furnace atomic absorption spectrometry (GF-AAS). After digestion, internal standard was added to the digestion solutions for measurements by ICP-OES and ICP-MS. For measurement by GF-AAS, additional purification of the digestion solution was conducted by back-extraction of the three metals into nitric acid solution after extraction into an organic solvent with ammonium pyrrolidine dithiocarbamate. Performance of the developed methods were evaluated for eight kinds of soft drinks.

  3. Influence of surface topography on the sputtering yields of silver

    International Nuclear Information System (INIS)

    Pan Jisheng; Wang Zhenxia; Tao Zhenlan; Zhang Jiping

    1992-01-01

    The sputtering yields of silver have been measured as a function of the fluence of incident Ar + ions (27 keV) using the collector technique and RBS analysis. The irradiated surface was examined by scanning electron microscopy (SEM). It is shown that the sputtering yields of surfaces with topography are enhanced relative to smooth surfaces of silver, but the extent of the enhancement depends on the irradiation dose. The experimental results can be explained assuming that the surface topography and sputtering yield are a function of incident angle. It is obvious that the surface topography is an important factor to influence the sputtering yield. The term ''apparent sputtering yield'' has specifically been used when referring to the experimental sputtering yield of a surface with topography, to emphasize the difference with a smooth surface. (orig.)

  4. Recent developments in reactively sputtered optical thin films

    Energy Technology Data Exchange (ETDEWEB)

    Pawlewicz, W.T.; Martin, P.M.; Hays, D.D.; Mann, I.B.

    1981-12-01

    Highlights of a multiyear effort to develop new or improved thin film optical coating materials through the use of reactive sputtering techniques are presented. Reactive sputtering is shown to be an extremely versatile technique capable of synthesizing broad classes of materials in a straightfoward manner. The exceptional utility of sputtering for preparation of hard coatings such as oxides, nitrides and novel materials based on Si and Ge is described. Some of these coating materials cannot be made by conventional evaporative techniques. Reactive sputtering is shown to allow precise control of coating composition, microstructure and the resulting optical properties. Examples of multilayer coatings such as all-dielectric and dielectric-enhanced mirrors made from reactively sputtered materials are included, and simple yet elegant fabrication techniques are introduced. The reactive sputtering technique and equipment used specifically for optical coatings are briefly described, and comparison is made with the conventional evaporative approach.

  5. Dwell time dependent morphological transition and sputtering yield of ion sputtered Sn

    International Nuclear Information System (INIS)

    Qian, H X; Zeng, X R; Zhou, W

    2010-01-01

    Self-organized nano-scale patterns may appear on a wide variety of materials irradiated with an ion beam. Good manipulation of these structures is important for application in nanostructure fabrication. In this paper, dwell time has been demonstrated to be able to control the ripple formation and sputtering yield on Sn surface. Ripples with a wavelength of 1.7 μm were observed for a dwell time in the range 3-20 μs, whereas much finer ripples with a wavelength of 540 nm and a different orientation were observed for a shorter dwell time in the range 0.1-2 μs. The sputtering yield increases with dwell time significantly. The results provide a new basis for further steps in the theoretical description of morphology evolution during ion beam sputtering.

  6. Molecular dynamics simulations with electronic stopping can reproduce experimental sputtering yields of metals impacted by large cluster ions

    Science.gov (United States)

    Tian, Jiting; Zhou, Wei; Feng, Qijie; Zheng, Jian

    2018-03-01

    An unsolved problem in research of sputtering from metals induced by energetic large cluster ions is that molecular dynamics (MD) simulations often produce sputtering yields much higher than experimental results. Different from the previous simulations considering only elastic atomic interactions (nuclear stopping), here we incorporate inelastic electrons-atoms interactions (electronic stopping, ES) into MD simulations using a friction model. In this way we have simulated continuous 45° impacts of 10-20 keV C60 on a Ag(111) surface, and found that the calculated sputtering yields can be very close to the experimental results when the model parameter is appropriately assigned. Conversely, when we ignore the effect of ES, the yields are much higher, just like the previous studies. We further expand our research to the sputtering of Au induced by continuous keV C60 or Ar100 bombardments, and obtain quite similar results. Our study indicates that the gap between the experimental and the simulated sputtering yields is probably induced by the ignorance of ES in the simulations, and that a careful treatment of this issue is important for simulations of cluster-ion-induced sputtering, especially for those aiming to compare with experiments.

  7. Characterization of Niobium Oxide Films Deposited by High Target Utilization Sputter Sources

    International Nuclear Information System (INIS)

    Chow, R; Ellis, A D; Loomis, G E; Rana, S I

    2007-01-01

    High quality, refractory metal, oxide coatings are required in a variety of applications such as laser optics, micro-electronic insulating layers, nano-device structures, electro-optic multilayers, sensors and corrosion barriers. A common oxide deposition technique is reactive sputtering because the kinetic mechanism vaporizes almost any solid material in vacuum. Also, the sputtered molecules have higher energies than those generated from thermal evaporation, and so the condensates are smoother and denser than those from thermally-evaporated films. In the typical sputtering system, target erosion is a factor that drives machine availability. In some situations such as nano-layered capacitors, where the device's performance characteristics depends on thick layers, target life becomes a limiting factor on the maximizing device functionality. The keen interest to increase target utilization in sputtering has been addressed in a variety of ways such as target geometry, rotating magnets, and/or shaped magnet arrays. Also, a recent sputtering system has been developed that generates a high density plasma, directs the plasma beam towards the target in a uniform fashion, and erodes the target in a uniform fashion. The purpose of this paper is to characterize and compare niobia films deposited by two types of high target utilization sputtering sources, a rotating magnetron and a high density plasma source. The oxide of interest in this study is niobia because of its high refractive index. The quality of the niobia films were characterized spectroscopically in optical transmission, ellipsometrically, and chemical stoichiometry with X-ray photo-electron spectroscopy. The refractive index, extinction coefficients, Cauchy constants were derived from the ellipsometric modeling. The mechanical properties of coating density and stress are also determined

  8. Formation of biocompatible surface layers depending on the sputtering distance

    Science.gov (United States)

    Nasakina, E. O.; Seregin, A. V.; Baikin, A. S.; Kaplan, M. A.; Konushkin, S. V.; Sergiyenko, K. V.; Kovaleva, E. D.; Kolmakova, A. A.; Leonov, A. V.; Sevost'yanov, M. A.; Kolmakov, A. G.; Simakov, S. V.

    2017-05-01

    Nano- and micro-dimensional surface layers of silver and tantalum on flat and wire NiTi substrates by the method of magnetron sputtering in vacuum were produced. The structure and composition of the samples were determined using SEM and Auger spectroscopy. With an increase in the sputtering distance, the thickness of the surface layers decreases, and the thickness of the transition layer and the dependence of the thickness change as a whole depend on the nature of the sputtered substance.

  9. Erosion of nanostructured tungsten by laser ablation, sputtering and arcing

    Directory of Open Access Journals (Sweden)

    Dogyun Hwangbo

    2017-08-01

    Full Text Available Mass loss of nanostructured tungsten, which was formed by helium plasma irradiation, due to laser ablation, sputtering, and arcing was investigated. Below the helium sputtering energy threshold (200eV. Reduction in sputtering on nanostructured surface was observed. Arcing was initiated using laser pulses, and the erosion rate by arcing was measured. The erosion rate increased with arc current, while the erosion per Coulomb was not affected by arc current.

  10. Energy dependent neutron sputtering and surface damage cross sections

    International Nuclear Information System (INIS)

    Odette, G.R.; Doiron, D.R.; Kennerley, R.J.

    1976-01-01

    The results clearly indicate that damage function analysis might be usefully applied to define both the neutron and primary recoil energy dependence of sputtering yields. Even with relatively large data errors, it appears that it is possible to both detect the existence and indicate the form of the deviation of sputtering yield from linear damage energy dependence (if such deviation exists). This information would be very useful in developing improved models of the sputtering phenomena

  11. Linear stability and instability patterns in ion-sputtered silicon

    Energy Technology Data Exchange (ETDEWEB)

    Madi, Charbel S; Bola George, H; Aziz, Michael J [Harvard School of Engineering and Applied Sciences, Cambridge, MA 02138 (United States)

    2009-06-03

    We study the patterns formed on Ar{sup +} ion-sputtered Si surfaces at room temperature as a function of the control parameters ion energy and incidence angle. We observe the sensitivity of pattern formation to artifacts such as surface contamination and report the procedures we developed to control them. We identify regions in control parameter space where holes, parallel mode ripples and perpendicular mode ripples form, and identify a region where the flat surface is stable. In the vicinity of the boundaries between the stable and pattern-forming regions, called bifurcations, we follow the time dependence from exponential amplification to saturation and examine the amplification rate and the wavelength in the exponential amplification regime. The resulting power laws are consistent with the theory of nonequilibrium pattern formation for a type I (constant wavelength) bifurcation at low angles and for a type II (diverging wavelength) bifurcation at high angles. We discuss the failure of all sputter rippling models to adequately describe these aspects of the simplest experimental system studied, consisting of an elemental, isotropic amorphous surface in the simplest evolution regime of linear stability.

  12. Magnetron Sputtered Molybdenum Oxide for Application in Polymers Solar Cells

    Science.gov (United States)

    Sendova-Vassileva, M.; Dikov, Hr; Vitanov, P.; Popkirov, G.; Gergova, R.; Grancharov, G.; Gancheva, V.

    2016-10-01

    Thin films of molybdenum oxide were deposited by radio frequency (RF) magnetron sputtering in Ar from a MoO3 target at different deposition power on glass and silicon substrates. The thickness of the films was determined by profilometer measurements and by ellipsometry. The films were annealed in air at temperatures between 200 and 400°C in air. The optical transmission and reflection spectra were measured. The conductivity of the as deposited and annealed films was determined. The crystal structure was probed by Raman spectroscopy. The oxidation state of the surface was studied by X-ray photoelectron spectroscopy (XPS) spectroscopy. The deposition technique described above was used to experiment with MoOx as a hole transport layer (HTL) in polymer solar cells with bulk hetrojunction active layer, deposited by spin coating. The performance of these layers was compared with poly(3,4-ethylenedioxythiophene):polystyrene sulfonate (PEDOT:PSS), which is the standard material used in this role. The measured current-voltage characteristics of solar cells with the structure glass/ITO/HTL/Poly(3-hexyl)thiophene (P3HT):[6,6]-phenyl-C61- butyric acid methyl ester (PCBM)/Al demonstrate that the studied MoOx layer is a good HTL and leads to comparable characteristics to those with PEDOT:PSS. On the other hand the deposition by magnetron sputtering guarantees reliable and repeatable HTLs.

  13. DGMK/OeGEW Spring meeting of the exploration and production department. Proceedings; DGMK/OeGEW-Fruehjahrstagung des Fachbereiches Aufsuchung und Gewinnung. Tagungsbericht

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2013-08-01

    Within the spring meeting 2013 of the exploration and production department of the German Society and Coal Science and Technology (DGMK, Hamburg, Federal Republic of Germany) and the Austrian Society of Petroleum Sciences (OeGEW, Vienna, Austria) at 18th and 19th April, 2013, in Celle (Federal Republic of Germany), lectures on the following themes were held: (1) Petroleum geology; (2) Environmental protection and occupational safety; (3) Drilling technology; (4) Petroleum and natural gas conveying technology; (5) Geophysics; (6) Underground storage technology; (7) Reservoir engineering. Additionally, posters were presented according to these themes.

  14. Effect of annealing temperature on surface morphology and ultralow ferromagnetic resonance linewidth of yttrium iron garnet thin film grown by rf sputtering

    Science.gov (United States)

    Cao Van, Phuoc; Surabhi, Srivathsava; Dongquoc, Viet; Kuchi, Rambabu; Yoon, Soon-Gil; Jeong, Jong-Ryul

    2018-03-01

    We report high-quality yttrium-iron-garnet (YIG; Y3Fe5O12) ultrathin films grown on {111} gadolinium-gallium-garnet (GGG; Gd3Ga5O12) substrates using RF sputtering deposition on an off-stoichiometric target and optimized thermal treatments. We measured a narrow peak-to-peak ferromagnetic resonance linewidth (ΔH) whose minimum value was 1.9 Oe at 9.43 GHz for a 60-nm-thick YIG film. This value is comparable to the most recently published value for a YIG thin film grown by pulsed laser deposition. The temperature dependence of the ΔH was investigated systematically, the optimal annealing condition for our growing condition was 875 °C. Structural analysis revealed that surface roughness and crystallinity played an important role in the observed ΔH broadening. Furthermore, the thickness dependence of the ΔH, which indicated that 60 nm thickness was optimal to obtain narrow ΔH YIG films, was also investigated. The thickness dependence of ΔH was understood on the basis of contributions of surface-associated magnon scattering and magnetic inhomogeneities to the ΔH broadening. Other techniques such as transmission electron microscopy, scanning electron microscopy, and X-ray diffraction were used to study the crystalline structure of the YIG films. The high quality of the films in terms of their magnetic properties was expressed through a very low coercivity and high saturation magnetization measured using a vibration sample magnetometer.

  15. Sputtering materials for VLSI and thin film devices

    CERN Document Server

    Sarkar, Jaydeep

    2010-01-01

    An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall p

  16. Data compilation of angular distributions of sputtered atoms

    International Nuclear Information System (INIS)

    Yamamura, Yasunori; Takiguchi, Takashi; Tawara, Hiro.

    1990-01-01

    Sputtering on a surface is generally caused by the collision cascade developed near the surface. The process is in principle the same as that causing radiation damage in the bulk of solids. Sputtering has long been regarded as an undesirable dirty effect which destroys the cathodes and grids in gas discharge tubes or ion sources and contaminates plasma and the surrounding walls. However, sputtering is used today for many applications such as sputter ion sources, mass spectrometers and the deposition of thin films. Plasma contamination and the surface erosion of first walls due to sputtering are still the major problems in fusion research. The angular distribution of the particles sputtered from solid surfaces can possibly provide the detailed information on the collision cascade in the interior of targets. This report presents a compilation of the angular distribution of sputtered atoms at normal incidence and oblique incidence in the various combinations of incident ions and target atoms. The angular distribution of sputtered atoms from monatomic solids at normal incidence and oblique incidence, and the compilation of the data on the angular distribution of sputtered atoms are reported. (K.I.)

  17. Process parameter impact on properties of sputtered large-area Mo bilayers for CIGS thin film solar cell applications

    Energy Technology Data Exchange (ETDEWEB)

    Badgujar, Amol C.; Dhage, Sanjay R., E-mail: dhage@arci.res.in; Joshi, Shrikant V.

    2015-08-31

    Copper indium gallium selenide (CIGS) has emerged as a promising candidate for thin film solar cells, with efficiencies approaching those of silicon-based solar cells. To achieve optimum performance in CIGS solar cells, uniform, conductive, stress-free, well-adherent, reflective, crystalline molybdenum (Mo) thin films with preferred orientation (110) are desirable as a back contact on large area glass substrates. The present study focuses on cylindrical rotating DC magnetron sputtered bilayer Mo thin films on 300 mm × 300 mm soda lime glass (SLG) substrates. Key sputtering variables, namely power and Ar gas flow rates, were optimized to achieve best structural, electrical and optical properties. The Mo films were comprehensively characterized and found to possess high degree of thickness uniformity over large area. Best crystallinity, reflectance and sheet resistance was obtained at high sputtering powers and low argon gas flow rates, while mechanical properties like adhesion and residual stress were found to be best at low sputtering power and high argon gas flow rate, thereby indicating a need to arrive at a suitable trade-off during processing. - Highlights: • Sputtering of bilayer molybdenum thin films on soda lime glass • Large area deposition using rotating cylindrical direct current magnetron • Trade of sputter process parameters power and pressure • High uniformity of thickness and best electrical properties obtained • Suitable mechanical and optical properties of molybdenum are achieved for CIGS application.

  18. Evaluation of antifungal metabolites activity from bacillus licheniformis OE-04 against Colletotrichum gossypii.

    Science.gov (United States)

    Nawaz, Hafiz Husnain; Nelly Rajaofera, M J; He, Qiguang; Anam, Usmani; Lin, Chunhua; Miao, Weiguo

    2018-04-01

    Anthracnose disease in the cotton plant caused by fungal pathogen Colletotrichum gossypii. It is supposed to be most critical diseases in the cotton crop as it causes infection and leads to complete damaging of the cotton crop by infecting the leaves, stems, and bolls in the field. The disease control is challenging due to the absence of an effective fungicide without damaging the farmer health and environment. So the series of experiments were designed to assess the antagonistic activity of biosurfactant released by strain Bacillus licheniformis OE-04 against the anthracnose causing agent in cotton and this strain was screened out from forty eight strain of rhizobacteria. We also estimated the heat stability and pH range and toxicity of biosurfactant produced by strain 0E-04. The results showed that biosurfactant has maximum antifungal activity against C. gossypii. In vitro study concluded that the biosurfactant can reduce fungal activity by inhibiting the spore germination of C. gossypii. Moreover, the biosurfactant also has wide pH and temperature range. We observed Antifungal activity of biosurfactant at 5 to 10 pH range and temperature range was also wide from room temperature to 100 °C. We also observed the toxicity of biosurfactant produced by Bacillus licheniformis against zebra fish (Danio rerio). We were noticed that biosurfactant have least harmful effect with maximum concentration. The study confirmed that biosurfactant of Bacillus licheniformis have high pH and heat stability range with least harmful effects so it can be a good replacement of chemical pesticides for cotton anthracnose control. Copyright © 2018 Elsevier Inc. All rights reserved.

  19. Sputtering effects on mirrors made of different tungsten grades

    Science.gov (United States)

    Voitsenya, V. S.; Ogorodnikova, O. V.; Bardamid, A. F.; Bondarenko, V. N.; Konovalov, V. G.; Lytvyn, P. M.; Marot, L.; Ryzhkov, I. V.; Shtan', A. F.; Skoryk, O. O.; Solodovchenko, S. I.

    2018-03-01

    Because tungsten (W) is used in present fusion devices and it is a reference material for ITER divertor and possible plasma-facing material for DEMO, we strive to understand the response of different W grades to ion bombardment. In this study, we investigated the behavior of mirrors made of four polycrystalline W grades under long-term ion sputtering. Argon (Ar) and deuterium (D) ions extracted from a plasma were used to investigate the effect of projectile mass on surface modification. Depending on the ion fluence, the reflectance measured at normal incidence was very different for different W grades. The lowest degradation rate of the reflectance was measured for the mirror made of recrystallized W. The highest degradation rate was found for one of the ITER-grade W samples. Pre-irradiation of a mirror with 20-MeV W6+ ions, as simulation of neutron irradiation in ITER, had no noticeable influence on reflectance degradation under sputtering with either Ar or D ions.

  20. Method validation for simultaneous determination of chromium, molybdenum and selenium in infant formulas by ICP-OES and ICP-MS.

    Science.gov (United States)

    Khan, Naeem; Jeong, In Seon; Hwang, In Min; Kim, Jae Sung; Choi, Sung Hwa; Nho, Eun Yeong; Choi, Ji Yeon; Kwak, Byung-Man; Ahn, Jang-Hyuk; Yoon, Taehyung; Kim, Kyong Su

    2013-12-15

    This study aimed to validate the analytical method for simultaneous determination of chromium (Cr), molybdenum (Mo), and selenium (Se) in infant formulas available in South Korea. Various digestion methods of dry-ashing, wet-digestion and microwave were evaluated for samples preparation and both inductively coupled plasma optical emission spectrometry (ICP-OES) and inductively coupled plasma mass spectrometry (ICP-MS) were compared for analysis. The analytical techniques were validated by detection limits, precision, accuracy and recovery experiments. Results showed that wet-digestion and microwave methods were giving satisfactory results for sample preparation, while ICP-MS was found more sensitive and effective technique than ICP-OES. The recovery (%) of Se, Mo and Cr by ICP-OES were 40.9, 109.4 and 0, compared to 99.1, 98.7 and 98.4, respectively by ICP-MS. The contents of Cr, Mo and Se in infant formulas by ICP-MS were found in good nutritional values in accordance to nutrient standards for infant formulas CODEX values. Copyright © 2013 Elsevier Ltd. All rights reserved.

  1. A matrix effect and accuracy evaluation for the determination of elements in milk powder LIBS and laser ablation/ICP-OES spectrometry.

    Science.gov (United States)

    Gilon, N; El-Haddad, J; Stankova, A; Lei, W; Ma, Q; Motto-Ros, V; Yu, J

    2011-11-01

    Laser ablation coupled to inductively coupled plasma optical emission spectrometry (LA-ICP-OES) and laser-induced breakdown spectroscopy (LIBS) were investigated for the determination of Ca, Mg, Zn and Na in milk samples. The accuracy of both methods was evaluated by comparison of the concentration found using LA-ICP-OES and LIBS with classical wet digestion associated with ICP-OES determination. The results were not fully acceptable, with biases from less than 1% to more than 60%. Matrix effects were also investigated. The sample matrix can influence the temperature, electron number density (n (e)) and other excitation characteristics in the ICP. These ICP characteristics were studied and evaluated during ablation of eight milk samples. Differences in n (e) (from 8.9 to 13.8 × 10(14) cm(-3)) and rotational temperature (ranging from 3,400 to 4,400 K) occurred with no correlation with trueness. LIBS results obtained after classical external calibration procedure gave degraded accuracy, indicating a strong matrix effect. The LIBS measurements clearly showed that the major problem in LA-ICP was related to the ablation process and that LIBS spectroscopy is an excellent diagnostic tool for LA-ICP techniques.

  2. Magnetron reactively sputtered Ti-DLC coatings on HNBR rubber : The influence of substrate bias

    NARCIS (Netherlands)

    Bui, X.L.; Pei, Y.T.; Hosson, J.Th.M. De

    2008-01-01

    In this study, Ti-containing diamond-like carbon (Ti-DLC) coatings have been deposited on HNBR (hydrogenated nitrile butadiene) rubber and also on Si wafer as reference via unbalanced magnetroli reactive sputtering from a Ti target in C2H2/Ar plasma. The deposition rates of coatings on rubber and Si

  3. Line-driven ablation of circumstellar discs - I. Optically thin decretion discs of classical Oe/Be stars.

    Science.gov (United States)

    Kee, Nathaniel Dylan; Owocki, Stanley; Sundqvist, J O

    2016-05-21

    The extreme luminosities of massive, hot OB stars drive strong stellar winds through line-scattering of the star's UV continuum radiation. For OB stars with an orbiting circumstellar disc, we explore here the effect of such line-scattering in driving an ablation of material from the disc's surface layers, with initial focus on the marginally optically thin decretion discs of classical Oe and Be stars. For this we apply a multidimensional radiation-hydrodynamics code that assumes simple optically thin ray tracing for the stellar continuum, but uses a multiray Sobolev treatment of the line transfer; this fully accounts for the efficient driving by non-radial rays, due to desaturation of line-absorption by velocity gradients associated with the Keplerian shear in the disc. Results show a dense, intermediate-speed surface ablation, consistent with the strong, blueshifted absorption of UV wind lines seen in Be shell stars that are observed from near the disc plane. A key overall result is that, after an initial adjustment to the introduction of the disc, the asymptotic disc destruction rate is typically just an order-unity factor times the stellar wind mass-loss rate. For optically thin Be discs, this leads to a disc destruction time of order months to years, consistent with observationally inferred disc decay times. The much stronger radiative forces of O stars reduce this time to order days, making it more difficult for decretion processes to sustain a disc in earlier spectral types, and so providing a natural explanation for the relative rarity of Oe stars in the Galaxy. Moreover, the decrease in line-driving at lower metallicity implies both a reduction in the winds that help spin-down stars from near-critical rotation, and a reduction in the ablation of any decretion disc; together these provide a natural explanation for the higher fraction of classical Be stars, as well as the presence of Oe stars, in the lower metallicity Magellanic Clouds. We conclude with a

  4. Focused microwave-induced combustion for digestion of botanical samples and metals determination by ICP OES and ICP-MS.

    Science.gov (United States)

    Barin, J S; Pereira, J S F; Mello, P A; Knorr, C L; Moraes, D P; Mesko, M F; Nóbrega, J A; Korn, M G A; Flores, E M M

    2012-05-30

    The advantages and shortcomings of focused microwave-induced combustion (FMIC) for digestion of plant samples were studied. The effects of sample mass, absorbing solution, oxygen gas flow-rate, and time of reflux step on recoveries of major, minor and trace metals were systematically evaluated. Afterwards, Al, Ba, Ca, Co, Cr, Cu, Mg, Mn, Ni, Sr, V, and Zn were determined by inductively coupled plasma optical emission spectrometry (ICP OES) and by inductively coupled plasma mass spectrometry (ICP-MS). The main advantages of FMIC when compared to microwave-assisted wet digestion (MAWD) and focused-microwave-assisted wet digestion (FMAWD) are the possibility to digest larger masses of samples (up to 3g) using shorter heating times and diluted nitric acid solution for absorbing all analytes. Using the selected experimental conditions for FMIC, residual carbon content was lower than 0.7% for all samples and relative standard deviation (RSD) varied from 1.5 to 14.1%. Certified reference materials (NIST 1515 apple leaves and NIST 1547 peach leaves) were used for checking accuracy and determined values for all metals were in agreement with certified values at a 95% confidence level. No statistical difference (ANOVA, 95% of confidence level) was observed for results obtained by FMIC, FMAWD, and MAWD. Limits of detection were lower when using FMIC in the range of 0.02-0.15 μg g(-1) for ICP OES and 0.001-0.01 μg g(-1) for ICP-MS, which were about 3 and 6 times lower than the values obtained by FMAWD and MAWD, respectively. It is important to point out that FMIC was a suitable sample preparation method for major, minor and trace metals by both determination techniques (ICP OES and ICP-MS). Additionally, since it allows lower LODs (because up to 3g of sample can be digested) and diluted acid solutions are used (without any further dilution), the use of ICP-MS is not mandatory. Copyright © 2012 Elsevier B.V. All rights reserved.

  5. Investigation of the drastic change in the sputter rate of polymers at low ion fluence

    International Nuclear Information System (INIS)

    Zekonyte, J.; Zaporojtchenko, V.; Faupel, F.

    2005-01-01

    The polymer sputter rate dependence on ion fluence and ion chemistry (Ar, N 2 , O 2 ) at 1 keV energy was investigated using a quartz crystal microbalance (QCM) which allowed to do real time etch rate measurements and to study kinetics of sputtering. The obtained sputter rates differed drastically from polymer to polymer showing, that the chemical structure of polymer is an important factor in the polymer etch yield. A decrease in the sputter rate was observed up to ion fluence of 5 x 10 14 -5 x 10 15 cm -2 (depending on the polymer type and ion chemistry) followed by the saturation in the rate at prolonged ion bombardment. Polymer removal was accompanied by the formation of degradation products, cross-linking or branching, modification of the surface chemical structure, which was studied in situ using XPS. The dependence of the surface glass transition temperature, T gs on the ion fluence was studied using the method based on the embedding of metallic nanoparticles. The correlation between chemical yield data and ablation rate is discussed

  6. Development of the sputter coater for hotcell

    Energy Technology Data Exchange (ETDEWEB)

    Chun, Yong Bum; Kwon, H. M.; Chun, Y. B.; Yang, Y. S.; Joo, J. S.; Jang, N. M

    2007-05-15

    In last december, the Wavelength Dispersive Spectroscopy (WDS) was installed on the shielded SEM of PIEF, KAERI. Before the first major WDS analysis service at the end of 2007, one among the prior technologies, the hot-cell sputter coater was remodelled from a commercial product and set up inside the glove box. This report describes effects of a coating layer on quantitative analysis, the remodelling of a coater suited to hot-cell, and the performance test of the remodelled coater. Also, written in 1998 was revised and appended to the report.

  7. DGEMP-OE (2008) Energy Baseline Scenario. Synthesis report

    International Nuclear Information System (INIS)

    2008-01-01

    the CAS scenarios relies primarily on 2000 data, despite the existence of sufficiently complete statistics through to 2005. The DGEMP on the other hand used a study by the BIPE (Office for Economic Information and Forecasting) provided by the SESP, the Ministry for Ecology, Energy, Sustainable Development and Spatial Planning's economic statistics and forecasting department. On the basis of the study's macro-economic projections of the French economy to 2020, the DGEMP was able to re-evaluate the prospects for activity in the industrial and tertiary sectors. In several respects (e.g. supply security, CO 2 emissions, energy efficiency), the baseline scenario proposed here is clearly not a scenario conducive to satisfying French energy policy objectives. This is not a surprising conclusion in that it implies the need to implement new policies and measures in addition to those already in place or approved. In particular, this scenario would lead to importing 66 billion cubic meters of gas (59 Mtoe) in 2020 and 78 billion cubic meters (70 Mtoe) in 2030, compared with the present 44 billion cubic meters. In addition to the resulting CO 2 emissions, the near doubling of gas imports would pose a twofold problem as to the geographic origin of the gas imported (under appropriate supply contracts) and the infrastructure (LNG terminals, gas pipelines) required to transport it. Finally, the baseline scenario is of course a long way from achieving the Community targets, whether for CO 2 emissions, projected to rise continually until 2020 and then even faster until 2030 (due to transport and electric power generation), or for the share of renewable energy in the energy mix. In that regard, the share of renewable energy in 'enlarged' final energy consumption, as it is described in the 'energy and climate change package', would grow to 13.4% in 2020 (versus 23% in the Commission's burden sharing proposal) and to 13.7% in 2030, compared with the 10.3% share observed in 2006

  8. Multielemental determination of trace elements in radiopharmaceuticals produced at the radiopharmacy center using ICP-OES technique

    International Nuclear Information System (INIS)

    Tavares, Angelica T.; Martins, Patricia de A.; Fukumori, Neuza T.O.; Mengatti, Jair; Matsuda, Margareth M.N.

    2013-01-01

    The control of chemical impurities in radiopharmaceuticals is critical to their safety and efficacy. According to the U.S. Pharmacopeia (USP), the elemental impurities with potential toxicity must be quantified. A proposed revision of USP 35 introduces the technique of atomic emission spectrometry for the analysis of elements. The aim of this work was to study the concentration of chemicals elements in FDG-Fluor-18, IPEN-TEC Generator and MIBI-TEC using an ICP-OES technique. One analytical curve composed by 27 elements (Ag, A1, B, Ba, Be, Bi, Ca, Cd, Co, Cr, Cu, Fe, Ga, K, Li, Mg, Mn, Mo, Na, Ni, Pb, Pd, Se, Sr, Te, T1, Zn) was constructed in two analytical ranges. The analyses were carried out simultaneously in an ICP-OES Vista MPX (Agilent). Some parameters for analysis and method validation were evaluated. The cleaning and maintenance of equipment influenced the emission intensity of the elements. 1.2 power and 10s sample uptake resulted in a consumption of 1.6 mL of sample and Mg II/Mg I ratio relation equal to 9.40. Linearity, LOD and LOQ were determined. The analysis were performed using 1:40 dilution with purified water. The main elements studied in this work were A1, Cu and Zn. The % recovery was determined with final concentrations of 0.3, 0.5 and 0.8 μg mL -1 . The analyses were performed in triplicate with three different batches. The % recovery was between 96.65 and 117.61% and the values for precision (CV) were less than 5% indicating good accuracy of the method. (author)

  9. Biopsy proportion of tumour predicts pathological tumour response and benefit from chemotherapy in resectable oesophageal carcinoma: results from the UK MRC OE02 trial.

    Science.gov (United States)

    Hale, Matthew D; Nankivell, Matthew; Hutchins, Gordon G; Stenning, Sally P; Langley, Ruth E; Mueller, Wolfram; West, Nicholas P; Wright, Alexander I; Treanor, Darren; Hewitt, Lindsay C; Allum, William H; Cunningham, David; Hayden, Jeremy D; Grabsch, Heike I

    2016-11-22

    Neoadjuvant chemotherapy followed by surgery is the standard of care for UK patients with locally advanced resectable oesophageal carcinoma (OeC). However, not all patients benefit from multimodal treatment and there is a clinical need for biomarkers which can identify chemotherapy responders. This study investigated whether the proportion of tumour cells per tumour area (PoT) measured in the pre-treatment biopsy predicts chemotherapy benefit for OeC patients. PoT was quantified using digitized haematoxylin/eosin stained pre-treatment biopsy slides from 281 OeC patients from the UK MRC OE02 trial (141 treated by surgery alone (S); 140 treated by 5-fluorouracil/cisplatin followed by surgery (CS)). The relationship between PoT and clinicopathological data including tumour regression grade (TRG), overall survival and treatment interaction was investigated. PoT was associated with chemotherapy benefit in a non-linear fashion (test for interaction, P=0.006). Only patients with a biopsy PoT between 40% and 70% received a significant survival benefit from neoadjuvant chemotherapy (N=129; HR (95%CI):1.94 (1.39-2.71), unlike those with lower or higher PoT (PoT70% (N=28, HR:0.65 (0.36-1.18)). High pre-treatment PoT was related to lack of primary tumour regression (TRG 4 or 5), P=0.0402. This is the first study to identify in a representative subgroup of OeC patients from a large randomized phase III trial that the proportion of tumour in the pre-chemotherapy biopsy predicts benefit from chemotherapy and may be a clinically useful biomarker for patient treatment stratification.Proportion of tumour is a novel biomarker which can be measured in the pre-treatment diagnostic biopsy and which may enable the identification of chemotherapy responders and non-responders among patients with oesophageal carcinoma. Proportion of tumour could easily become part of the routine reporting of oesophageal cancer biopsies and may aid in managing patients with borderline resectable cancer.

  10. Application of magnetron sputtering for producing bioactive ceramic ...

    Indian Academy of Sciences (India)

    Radio frequency (RF) magnetron sputtering is a versatile deposition technique that can produce thin, uniform, dense calcium phosphate coatings. In this paper, principle and character of magnetron sputtering is introduced, and development of the hydroxyapatite and its composite coatings application is reviewed. In addition ...

  11. RF sputtering: A viable tool for MEMS fabrication

    Indian Academy of Sciences (India)

    RF sputtering: A viable tool for MEMS fabrication. 545 obtain highly c-axis oriented films, which is a requirement for these films to be piezoelectric in nature. In addition to the dielectric films, thin films of Cr, Au, Ti and Pt on silicon or glass substrates, (used for ZnO deposition) were also deposited by RF sputtering process.

  12. Sputtering of solid nitrogen by keV helium ions

    DEFF Research Database (Denmark)

    Ellegaard, O.; Schou, Jørgen; Sørensen, H.

    1993-01-01

    Solid nitrogen has become a standard material among the frozen molecular gases for electronic sputtering. We have combined measurements of sputtering yields and energy spectra from nitrogen bombarded by 4-10 keV helium ions. The data show that the erosion is electronic rather than knockon...

  13. Method of low tantalum amounts determination in niobium and its compounds by ICP-OES technique.

    Science.gov (United States)

    Smolik, Marek; Turkowska, Magdalena

    2013-10-15

    A method of determination of low amounts of tantalum in niobium and niobium compounds without its prior separation by means of inductively coupled plasma optical emission spectrometry (ICP-OES) has been worked out. The method involves dissolution of the analyzed samples of niobium as well as its various compounds (oxides, fluorides, chlorides, niobates(V)) in fluoride environments, precipitation of sparingly soluble niobic(tantalic) acid (Nb2O5(Ta2O5) · xH2O), converting them into soluble complex compounds by means of oxalic acid with addition of hydrogen peroxide and finally analyzing directly obtained solutions by ICP-OES. This method permits determination of Ta in niobium at the level of 10(-3)% with relatively good precision (≤ 8% RSD) and accuracy (recovery factor: 0.9-1.1). Relative differences in the results obtained by two independent methods (ICP-OES and ICP-MS) do not exceed 14%, and other elements present in niobium compounds (Ti, W, Zr, Hf, V, Mo, Fe, Cr) at the level of 10(-2)% do not affect determination. © 2013 Elsevier B.V. All rights reserved.

  14. Application of ICP-OES for evaluating energy extraction and production wastewater discharge impacts on surface waters in Western Pennsylvania.

    Science.gov (United States)

    Pancras, Joseph Patrick; Norris, Gary A; Landis, Matthew S; Kovalcik, Kasey D; McGee, John K; Kamal, Ali S

    2015-10-01

    Oil and gas extraction and coal-fired electrical power generating stations produce wastewaters that are treated and discharged to rivers in Western Pennsylvania with public drinking water system (PDWS) intakes. Inductively coupled plasma optical emission spectroscopy (ICP-OES) was used to quantify inorganic species in wastewater and river samples using a method based on EPA Method 200.7 rev4.4. A total of 53 emission lines from 30 elements (Al, As, B, Ba, Ca, Cd, Ce, Co, Cr, Cu, Fe, K, Li, Mg, Mn, Mo, Na, Ni, P, Pb, S, Sb, Se, Si, Sn, Sr, Ti, Tl, V, and Zn) were investigated. Samples were prepared by microwave-assisted acid digestion using a mixture of 2% HNO3 and 0.5% HCl. Lower interferences and better detection characteristics resulted in selection of alternative wavelengths for Al, As, Sb, Mg, Mo, and Na. Radial view measurements offered accurate determinations of Al, Ba, K, Li, Na, and Sr in high-brine samples. Spike recovery studies and analyses of reference materials showed 80-105% recoveries for most analytes. This method was used to quantify species in samples with high to low brine concentrations with method detection limits a factor of 2 below the maximum contaminant limit concentrations of national drinking water standards. Elements B, Ca, K, Li, Mg, Na, and Sr were identified as potential tracers for the sources impacting PDWS intakes. Usability of the ICP-OES derived data for factor analytic model applications was also demonstrated. Published by Elsevier B.V.

  15. Atomistic self-sputtering mechanisms of rf breakdown in high-gradient linacs

    International Nuclear Information System (INIS)

    Insepov, Z.; Norem, J.; Veitzer, S.

    2010-01-01

    Molecular dynamics (MD) models of sputtering solid and liquid surfaces - including the surfaces charged by interaction with plasma, Coulomb explosion, and Taylor cone formation - were developed. MD simulations of self-sputtering of a crystalline (1 0 0) copper surface by Cu + ions in a wide range of ion energies (50 eV-50 keV) were performed. In order to accommodate energetic ion impacts on a target, a computational model was developed that utilizes MD to simulate rapid atomic collisions in the central impact zone, and a finite-difference method to absorb the energy and shock wave for the collisional processes occurring at a longer time scales. The sputtering yield increases if the surface temperature rises and the surface melts as a result of heat from plasma. Electrostatic charging of the surface under bombardment with plasma ions is another mechanism that can dramatically increase the sputtering yield because it reduces the surface binding energy and the surface tension. An MD model of Taylor cone formation at a sharp tip placed in a high electric field was developed, and the model was used to simulate Taylor cone formation for the first time. Good agreement was obtained between the calculated Taylor cone angle (104.3 deg.) and the experimental one (98.6 deg.). A Coulomb explosion (CE) was proposed as the main surface failure mechanism triggering breakdown, and the dynamics of CE was studied by MD.

  16. A review of basic phenomena and techniques for sputter-deposition of high temperature superconducting films

    Energy Technology Data Exchange (ETDEWEB)

    Auciello, O. (Microelectronics Center of North Carolina, Research Triangle Park, NC (USA) North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering); Ameen, M.S.; Kingon, A.I.; Lichtenwalner, D.J. (North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering); Krauss, A.R. (Argonne National Lab., IL (USA))

    1990-01-01

    The processes involved in plasma and ion beam sputter-deposition of high temperature superconducting thin films are critically reviewed. Recent advances in the development of these techniques are discussed in relation to basic physical phenomena, specific to each technique, which must be understood before high quality films can be produced. Control of film composition is a major issue in sputter-deposition of multicomponent materials. Low temperature processing of films is a common goal for each technique, particularly in relation to integrating high temperature superconducting films with the current microelectronics technology. It has been understood for some time that for Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} deposition, the most intensely studied high-{Tc} compound, incorporation of sufficient oxygen into the film during deposition is necessary to produce as-deposited superconducting films at relatively substrate temperatures. Recent results have shown that with the use of suitable buffer layers, high quality Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} sputtered films can be obtained on Si substrates without the need for post-deposition anneal processing. This review is mainly focussed on issues related to sputter-deposition of Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} thin films, although representative results concerning the bismuth and thallium based compounds are included. 143 refs., 11 figs.

  17. Thermal conductivities of thin, sputtered optical films

    International Nuclear Information System (INIS)

    Henager, C.H. Jr.; Pawlewicz, W.T.

    1991-05-01

    The normal component of the thin film thermal conductivity has been measured for the first time for several advanced sputtered optical materials. Included are data for single layers of boron nitride (BN), aluminum nitride (AIN), silicon aluminum nitride (Si-Al-N), silicon aluminum oxynitride (Si-Al-O-N), silicon carbide (SiC), and for dielectric-enhanced metal reflectors of the form Al(SiO 2 /Si 3 N 4 ) n and Al(Al 2 O 3 /AIN) n . Sputtered films of more conventional materials like SiO 2 , Al 2 O 3 , Ta 2 O 5 , Ti, and Si have also been measured. The data show that thin film thermal conductivities are typically 10 to 100 times lower than conductivities for the same materials in bulk form. Structural disorder in the amorphous or very fine-grained films appears to account for most of the conductivity difference. Conclusive evidence for a film/substrate interface contribution is presented

  18. On a relationship between the geometry of cones on sputtered surfaces and the angular dependence of sputtered yields

    International Nuclear Information System (INIS)

    Chadderton, L.T.

    1977-01-01

    It is widely believed that the phenomenon responsible for the familiar peak in the angular dependence of sputtered yields also gives rise to characteristic semiangles α of conical protruberances on sputtered surfaces. It is shown that α corresponds to the process giving rise to the minimum rather than the maximum. No accurate measurements of the minimum have yet been made. (Auth.)

  19. DGEMP-OE (2008) Energy Baseline Scenario. Synthesis report; Scenario energetique de reference DGEMP-OE(2008). Rapport de synthese

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2008-07-01

    ;reference' at national level. - Finally, the MEDEE energy demand model applied in the CAS scenarios relies primarily on 2000 data, despite the existence of sufficiently complete statistics through to 2005. The DGEMP on the other hand used a study by the BIPE (Office for Economic Information and Forecasting) provided by the SESP, the Ministry for Ecology, Energy, Sustainable Development and Spatial Planning's economic statistics and forecasting department. On the basis of the study's macro-economic projections of the French economy to 2020, the DGEMP was able to re-evaluate the prospects for activity in the industrial and tertiary sectors. In several respects (e.g. supply security, CO{sub 2} emissions, energy efficiency), the baseline scenario proposed here is clearly not a scenario conducive to satisfying French energy policy objectives. This is not a surprising conclusion in that it implies the need to implement new policies and measures in addition to those already in place or approved. In particular, this scenario would lead to importing 66 billion cubic meters of gas (59 Mtoe) in 2020 and 78 billion cubic meters (70 Mtoe) in 2030, compared with the present 44 billion cubic meters. In addition to the resulting CO{sub 2} emissions, the near doubling of gas imports would pose a twofold problem as to the geographic origin of the gas imported (under appropriate supply contracts) and the infrastructure (LNG terminals, gas pipelines) required to transport it. Finally, the baseline scenario is of course a long way from achieving the Community targets, whether for CO{sub 2} emissions, projected to rise continually until 2020 and then even faster until 2030 (due to transport and electric power generation), or for the share of renewable energy in the energy mix. In that regard, the share of renewable energy in 'enlarged' final energy consumption, as it is described in the 'energy and climate change package', would grow to 13.4% in 2020 (versus 23% in the

  20. GAS FLOW CONTROL SYSTEM IN REACTIVE MAGNETRON SPUTTERING TECHNOLOGY

    Directory of Open Access Journals (Sweden)

    I. M. Klimovich

    2015-01-01

    Full Text Available  It is known that the discharge parameters and the chemical composition of the particles flux impinging onto the substrate during a reactive magnetron sputtering are unstable. As a result spontaneous transitions between the «metal» mode of the target surface and the «poisoned» mode of the target surface have been observed. This leads to nonrepeatability of the coating compositions from process to process. The aim of this work is to design a gas flow control system for reactive sputtering processes. The control system allows to maintain a steady nonequilibrium state of the magnetron discharge in transition mode where the chemical state of the target surface is unstable. The intensities of spectral lines of the discharge spectrum are proposed as control parameters. Photodiode detectors were used for registration of intensities of spectral lines. A gas flow control system regulates argon and reactive gas flow automatically, using feedback signals from photodiode detectors on the intensities of the spectral lines, vacuum gauge, ion current sensor, sensors of discharge current and voltage. As an example, the process of reactive magnetron Ti-Al-N deposition is considered. The following discharge parameters are controlled during sputtering a composite target based on Ti with Al cylindrical inserts: current, voltage, total pressure of a gas mixture, substrate temperature, bias voltage and current of the substrate. Nitrogen flow was controlled by the spectral line intensity of titanium TiI 506,5 nm. The value of the line intensity is connected with the value of reactivity. Elemental composition and structure of the Ti-Al-N coatings were studied using Rutherford backscattering spectroscopy, scanning electron microscopy and X-ray diffraction. It was found, that stoichiometric Ti-Al-N coatings have a globular structure, enhanced hardness and low friction coefficient in contrast to Ti-Al-N coatings with nonstoichiometric composition, which have a

  1. Annealing effect in structural and electrical properties of sputtered Mo thin film

    Energy Technology Data Exchange (ETDEWEB)

    Chelvanathan, P.; Zakaria, Z. [Solar Energy Research Institute, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Yusoff, Y. [Department of Electrical, Electronic and System Engineering, FKAB, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Akhtaruzzaman, M. [Solar Energy Research Institute, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Alam, M.M. [Advanced Materials Research Chair, Chemistry Department, College of Sciences, King Saud University, Riyadh 11451 (Saudi Arabia); Alghoul, M.A.; Sopian, K. [Solar Energy Research Institute, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Amin, N., E-mail: nowshadamin@yahoo.com [Solar Energy Research Institute, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Department of Electrical, Electronic and System Engineering, FKAB, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Advanced Materials Research Chair, Chemistry Department, College of Sciences, King Saud University, Riyadh 11451 (Saudi Arabia)

    2015-04-15

    Highlights: • We deposited Mo thin film by DC-sputtering for solar cell back contact application. • We examined the changes in the film quality in terms of structural, and electrical upon vacuum thermal annealing. • Vacuum thermal annealing at different temperature changes the degree of preferred orientation of (1 1 0) and (2 1 1) significantly. • Correlation of structural and electrical parameters was carried out. - Abstract: In this study, the effects of vacuum annealing on the structural and electrical properties of DC-sputtered molybdenum (Mo) thin films have been investigated. Mo thin films were deposited by DC sputtering and subsequently subjected to vacuum annealing in a tube furnace from 350 to 500 °C. Films that were deposited with different temperatures showed good adhesion with soda lime glass substrate after “tape testing”. X-ray diffraction (XRD) spectra have indicated existence of (1 1 0) and (2 1 1) orientations. However, I(1 1 0)/I(2 1 1) peak intensity ratio decreased for all vacuum annealed Mo films compared to as-sputtered films indicating change of preferential orientation. This suggests vacuum annealing can be employed to tailor the Mo thin film atomic packing density of the plane parallel to the substrate. SEM images of surface morphology clearly show compact and dense triangular like grains for as-sputtered film, while annealed films at 350 °C, 400 °C and 450 °C indicate rice-like grains. Stony grains with less uniformity were detected for films annealed for 500 °C. Meanwhile, electrical resistivity is insensitive to the vacuum annealing condition as all films showed more or less same resistivity in the range of 3 × 10{sup −5}–6 × 10{sup −5} Ω cm.

  2. Morphological features in aluminum nitride epilayers prepared by magnetron sputtering

    Directory of Open Access Journals (Sweden)

    Stach Sebastian

    2015-03-01

    Full Text Available The aim of this study is to characterize the surface topography of aluminum nitride (AlN epilayers prepared by magnetron sputtering using the surface statistical parameters, according to ISO 25178-2:2012. To understand the effect of temperature on the epilayer structure, the surface topography was investigated through atomic force microscopy (AFM. AFM data and analysis of surface statistical parameters indicated the dependence of morphology of the epilayers on their growth conditions. The surface statistical parameters provide important information about surface texture and are useful for manufacturers in developing AlN thin films with improved surface characteristics. These results are also important for understanding the nanoscale phenomena at the contacts between rough surfaces, such as the area of contact, the interfacial separation, and the adhesive and frictional properties.

  3. Optical characterisation of sputtered hydrogenated amorphous silicon thin films

    International Nuclear Information System (INIS)

    Mellassi, K.; Chafik El Idrissi, M.; Chouiyakh, A.; Rjeb, A.; Barhdadi, A.

    2000-09-01

    The present work is devoted to the study of some optical properties of hydrogenated amorphous silicon (a-Si:H) thin films prepared by radio-frequency cathodic sputtering technique. It is essentially focused on investigating separately the effects of increasing partial hydrogen pressure during the deposition stage, and the effects of post deposition thermal annealing on the main optical parameters of the deposited layers (refraction index, optical gap Urbach energy, etc.). We show that low hydrogen pressures allow a saturation of the dangling bonds in the material, while high pressures lead to the creation of new defects. We also show that thermal annealing under moderate temperatures allows a good improvement of the structural quality of deposited films. (author)

  4. Molecular dynamics simulation of gold cluster growth during sputter deposition

    Energy Technology Data Exchange (ETDEWEB)

    Abraham, J. W., E-mail: abraham@theo-physik.uni-kiel.de; Bonitz, M., E-mail: bonitz@theo-physik.uni-kiel.de [Institut für Theoretische Physik und Astrophysik, Christian-Albrechts-Universität zu Kiel, Leibnizstraße 15, D-24098 Kiel (Germany); Strunskus, T.; Faupel, F. [Institut für Materialwissenschaft, Lehrstuhl für Materialverbunde, Christian-Albrechts-Universität zu Kiel, Kaiserstraße 2, D-24143 Kiel (Germany)

    2016-05-14

    We present a molecular dynamics simulation scheme that we apply to study the time evolution of the self-organized growth process of metal cluster assemblies formed by sputter-deposited gold atoms on a planar surface. The simulation model incorporates the characteristics of the plasma-assisted deposition process and allows for an investigation over a wide range of deposition parameters. It is used to obtain data for the cluster properties which can directly be compared with recently published experimental data for gold on polystyrene [M. Schwartzkopf et al., ACS Appl. Mater. Interfaces 7, 13547 (2015)]. While good agreement is found between the two, the simulations additionally provide valuable time-dependent real-space data of the surface morphology, some of whose details are hidden in the reciprocal-space scattering images that were used for the experimental analysis.

  5. Discharge Physics of High Power Impulse Magnetron Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2010-10-13

    High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading to plasma conditions that make ionization of the sputtered atoms very likely. A brief review of HIPIMS operation is given in a tutorial manner, illustrated by some original data related to the self-sputtering of niobium in argon and krypton. Emphasis is put on the current-voltage-time relationships near the threshold of self-sputtering runaway. The great variety of current pulse shapes delivers clues on the very strong gas rarefaction, self-sputtering runaway conditions, and the stopping of runaway due to the evolution of atom ionization and ion return probabilities as the gas plasma is replaced by metal plasma. The discussions are completed by considering instabilities and the special case of ?gasless? self-sputtering.

  6. Reactive dual magnetron sputtering for large area application

    International Nuclear Information System (INIS)

    Struempfel, J.

    2002-01-01

    Production lines for large area coating demand high productivity of reactive magnetron sputtering processes. Increased dynamic deposition rates for oxides and nitrides were already obtained by using of highly powered magnetrons in combination with advanced sputter techniques. However, besides high deposition rates the uniformity of such coatings has to be carefully considered. First the basics of reactive sputtering processes and dual magnetron sputtering are summarized. Different methods for process stabilization and control are commonly used for reactive sputtering. The Plasma Emission Monitor (PE M) offers the prerequisite for fast acting process control derived from the in-situ intensity measurements of a spectral line of the sputtered target material. Combined by multiple Plasma Emission Monitor control loops segmented gas manifolds are able to provide excellent thin film uniformity at high deposition rates. The Dual Magnetron allows a broad range of processing by different power supply modes. Medium frequency, DC and pulsed DC power supplies can be used for high quality layers. Whereas the large area coating of highly isolating layers like TiO 2 or SiO 2 is dominated by MF sputtering best results for coating with transparent conductive oxides are obtained by dual DC powering of the dual magnetron arrangement. (Author)

  7. The fast spin of near-Earth asteroid (455213) 2001 OE84, revisited after 14 years: Constraints on internal structure

    Science.gov (United States)

    Polishook, D.; Moskovitz, N.; Thirouin, A.; Bosh, A.; Levine, S.; Zuluaga, C.; Tegler, S. C.; Aharonson, O.

    2017-11-01

    At a mean diameter of ∼650 m, the near-Earth asteroid (455213) 2001 OE84 (OE84 for short) has a rapid rotation period of 0.486542 ± 0.000002 h, which is uncommon for asteroids larger than ∼200 m. We revisited OE84 14 years after it was first, and last, observed by Pravec et al. (2002) in order to measure again its spin rate and to search for changes. We have confirmed the rapid rotation and, by fitting the photometric data from 2001 and 2016 using the lightcurve inversion technique, we determined a retrograde sense of rotation, with the spin axis close to the ecliptic south pole; an oblate shape model of a / b = 1.32 ± 0.04 and b / c = 1.8 ± 0.2 ; and no change in spin rate between 2001 and 2016. Using these parameters we constrained the body's internal strength, and found that current estimations of asteroid cohesion (up to ∼80 Pa) are insufficient to maintain an intact rubble pile at the measured spin rate of OE84. Therefore, we argue that a monolithic asteroid, that can rotate at the rate of OE84 without shedding mass and without slowing down its spin rate, is the most plausible for OE84, and we give constraints on its age, since the time it was liberated from its parent body, between 2 - 10 million years.

  8. High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system

    Science.gov (United States)

    Sproul, William D.; Rudnik, Paul J.; Graham, Michael E.; Rohde, Suzanne L.

    1990-01-01

    Attention is given to an opposed cathode sputtering system constructed with the ability to coat parts with a size up to 15 cm in diameter and 30 cm in length. Initial trials with this system revealed very low substrate bias currents. When the AlNiCo magnets in the two opposed cathodes were arranged in a mirrored configuration, the plasma density at the substrate was low, and the substrate bias current density was less than 1 mA/sq cm. If the magnets were arranged in a closed-field configuration where the field lines from one set of magnets were coupled with the other set, the substrate bias current density was as high as 5.7 mA/sq cm when NdFeB magnets were used. In the closed-field configuration, the substrate bias current density was related to the magnetic field strength between the two cathodes and to the sputtering pressure. Hard well-adhered TiN coatings were reactively sputtered in the opposed cathode system in the closed-field configuration, but the mirrored configuration produced films with poor adhesion because of etching problems and low plasma density at the substrate.

  9. Transport theory of sputtering I: Depth of origin of sputtered atoms

    International Nuclear Information System (INIS)

    Zhang, Zhu Lin

    1999-01-01

    Sputter theory employing a sum of two power cross sections has been implemented. Compared with the well known Lindhard power cross section (V∝r -1/m ), a sum of two such cross sections can give a much better approximation to the Born-Mayer scattering in the low energy region (m ∼ 0.1). By using both one and two power cross sections, we have solved the linear transport equations describing the sputtering problem asymptotically. As usual, electronic stopping is ignored in the analysis. It has further been proved that Falcone's theory of the atom ejection process contradicts transport theory. The Andersen-Sigmund relation for partial sputtering yield ratios between two elements in an arbitrary multicomponent target has been derived by both methods. The energy deposited in the target surface layers has been computed for a few typical ion-target combinations. The numerical curves show that both theories generate almost the same results (error m≥0. The former even may be only about one half of the latter as long as m=0

  10. Closed field magnetron sputtering: new generation sputtering process for optical coatings

    Science.gov (United States)

    Gibson, D. R.; Brinkley, I.; Waddell, E. M.; Walls, J. M.

    2008-09-01

    "Closed field" magnetron (CFM) sputtering offers a flexible and high throughput deposition process for optical coatings and thin films. CFM sputtering uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics, metals and conductive oxides. Moreover, CFM provides a room temperature deposition process with high ion current density, low bias voltage and reactive oxidation in the entire volume around the rotating substrate drum carrier, thereby producing films over a large surface area at high deposition rate with excellent and reproducible optical properties. Machines based on the Closed Field are scaleable to meet a range of batch and in-line size requirements. Typically, thin film thickness control to <+/-1% is accomplished simply using time, although optical monitoring can be used for more demanding applications. Fine layer thickness control and deposition of graded index layers is also assisted with a specially designed rotating shutter mechanism. This paper presents data on optical properties for CFM deposited optical coatings, including anti-reflection, thermal control filters, graded coatings, narrowband filters as well as conductive transparent oxides such as indium tin oxide and carbide films. Benefits of the CFM sputter process are described.

  11. Sputtered protective coatings for die casting dies

    Science.gov (United States)

    Mirtich, M. J.; Nieh, C.-Y.; Wallace, J. F.

    1981-01-01

    Three experimental research designs investigating candidate materials and processes involved in protective die surface coating procedures by sputter deposition, using ion beam technologies, are discussed. Various pre-test results show that none of the coatings remained completely intact for 15,000 test cycles. The longest lifetime was observed for coatings such as tungsten, platinum, and molybdenum which reduced thermal fatigue, but exhibited oxidation and suppressed crack initiation only as long as the coating did not fracture. Final test results confirmed earlier findings and coatings with Pt and W proved to be the candidate materials to be used on a die surface to increase die life. In the W-coated specimens, which remained intact on the surface after thermal fatigue testing, no oxidation was found under the coating, although a few cracks formed on the surface where the coating broke down. Further research is planned.

  12. Determination of trace metals in electrolytic copper by ICP OES and ICP-MS

    Directory of Open Access Journals (Sweden)

    Éder José dos Santos

    2005-09-01

    Full Text Available The performance of axial view ICP OES and ICP-MS techniques were compared through the determination of As, Fe, Mn, Pb, Sb and Sn in electrolytic copper. Samples were prepared by two procedures: 1. Total dissolution with 5 % v/v HNO3 and 2. Dissolution with 1.4 % v/v HNO3 plus 2.0 % v/v H2SO4, followed by separation of the Cu by electrodeposition. The methods were applied for the analysis of standard copper solutions, using calibration against aqueous solutions with or without the addition of Cu. The results obtained by the two techniques were similar, but the separation of Cu from the sample matrix proved to be more adequate for practical reasons.O presente trabalho apresenta um estudo comparativo das técnicas ICP-MS e ICP OES com configuração axial e também de dois métodos diferentes de tratamento das amostras, ou seja, por dissolução total com e sem separação do cobre por eletrodeposição, para as determinações de As, Fe, Mn, Pb, Sb e Sn em amostras de cobre eletrolítico. Amostras comerciais e industriais foram dissolvidas com HNO3 5% v/v e o cobre foi eletrodepositado em meio de HNO3 (1,4% v/v e H2SO4 (2,0% v/v. Verificou-se que a separação do cobre foi eficiente, contudo se constatou contaminação de Fe e Sn durante o processo de eletrodeposição. As determinações foram realizadas utilizando-se um ICP OES Axial Varian (Vista Pro e um ICP-MS Perkin Elmer (Elan Sciex 6000. Foi aplicada a calibração externa, com soluções padrão contendo ou não cobre na concentração equivalente à da amostra. Os limites de detecção (3s, n=10 para a técnica de ICP OES foram bastante semelhantes na presença ou não do cobre. Já usando ICP-MS, os limites foram melhores na ausência do cobre. Com o objetivo de estabelecer o nível de significância entre as técnicas de quantificação, ou seja, entre ICP OES e ICP-MS,foi aplicado o teste t emparelhado, que demonstrou, para um nível de confiança de 95%, não haver diferen

  13. The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Lisco, F., E-mail: F.Lisco@lboro.ac.uk [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom); Kaminski, P.M.; Abbas, A.; Bass, K.; Bowers, J.W.; Claudio, G. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom); Losurdo, M. [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari (Italy); Walls, J.M. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom)

    2015-05-01

    Cadmium sulphide (CdS) thin films were deposited by two different processes, chemical bath deposition (CBD), and pulsed DC magnetron sputtering (PDCMS) on fluorine doped-tin oxide coated glass to assess the potential advantages of the pulsed DC magnetron sputtering process. The structural, optical and morphological properties of films obtained by CBD and PDCMS were investigated using X-ray photoelectron spectroscopy, X-ray diffraction, scanning and transmission electron microscopy, spectroscopic ellipsometry and UV-Vis spectrophotometry. The as-grown films were studied and comparisons were drawn between their morphology, uniformity, crystallinity, and the deposition rate of the process. The highest crystallinity is observed for sputtered CdS thin films. The absorption in the visible wavelength increased for PDCMS CdS thin films, due to the higher density of the films. The band gap measured for the as-grown CBD-CdS is 2.38 eV compared to 2.34 eV for PDCMS-CdS, confirming the higher density of the sputtered thin film. The higher deposition rate for PDCMS is a significant advantage of this technique which has potential use for high rate and low cost manufacturing. - Highlights: • Pulsed DC magnetron sputtering (PDCMS) of CdS films • Chemical bath deposition of CdS films • Comparison between CdS thin films deposited by chemical bath and PDCMS techniques • High deposition rate deposition for PDCMS deposition • Uniform, pinhole free CdS thin films.

  14. Determination of Microelements in Human Milk and Infant Formula Without Digestion by ICP-OES.

    Science.gov (United States)

    Đurović, Dijana; Milisavljević, Branka; Nedović-Vuković, Mirjana; Potkonjak, Branislav; Spasić, Snežana; Vrvić, Miroslav

    2017-06-01

    The concentrations of zinc (Zn), iron (Fe) and copper (Cu) in both human milk and infant formula were determined using a new sample preparation method, by inductively coupled plasma - optical emission spectometry (ICP-OES) and flame atomic absorption spectrometry (FAAS). Human milk samples were diluted in ultrapure water. The infant formula of powder samples (suitable for an infant 1-6 months of age) and standard reference material (SRM-1849) were analyzed in parallel. The results have shown that FAAS method was more sensitive for Fe determination in human milk while ICP-OES was more sensitive for both Zn and Cu detection. The limit of quantification for both Zn and Cu was 5 μg L-1 and 10 μg L-1 for Fe and the recovery for Zn, Fe and Cu was ranged from 90% to 94%, 97% to 103% and 90% to 102%, respectively. Mean concentrations of Zn, Fe, and Cu in human milk samples were 5.35, 0.47 and 0.83 mg L-1, respectively while these values in infant formula were ranged from 3.52-4.75 mg L-1, 3.37-4.56 mg L-1 and 0.28-0.41 mg L-1, respectively. Despite the sample complexity, the proposed method using dilution of milk samples with water was simple, rapid, effective and accurate. ICP-OES was a better method for Zn determination while FAAS was a better method for Fe determination. In the case of Cu both methods were comparable.

  15. DGMK/OeGEW spring meeting of the exploration and production department. Proceedings; DGMK/OeGEW-Fruehjahrstagung des Fachbereichs Aufsuchung und Gewinnung. Tagungsbericht

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2009-07-01

    Within the spring meeting 2009 of the exploration and production department of the German Society and Coal Science and Technology (DGMK, Hamburg, Federal Republic of Germany) and the Austrian Society of Petroleum Sciences (OeGEW, Vienna, Austria) at 27th and 28th April, 2009, in Celle (Federal Republic of Germany), the following lectures were held: (1) Natural gas for Europe - Where does it come from, and how safe is it?; (2) Fluid dynamics in salt-encased carbonates; (3) Predicting petroleum fluid quality and quantity by using the PhaseKinetic approach for a basin modelling study in the Jeanne d'Arc Basin, offshore Newfoundland, Canada; (4) Models of geomechanical reservoirs for the prognosis of tectonic stresses and crack grids - concept and case study from the Sirte Basin / Libya; (5) A depositional model and sequence stratigraphic correlation for Ordovician glacial deposits, Illizi Basin, Algeria; (6) Palynology of the upper Silurian to Middle Devonian of wells from the Reggane Basin, southern Algeria; (7) Evaluation of heterogeneities in petroleum deposits by mans of asphaltene; (8) Experiments to reactions of n-alkanes with hematite in clastic reservoir rocks; (9) Organic geochemical characterization of terrestrial source rocks of the Triassic Madygen Formation (Southern Tien Shan, Kyrgyzstan); (10) Mud Volcanoes of Azerbaijan - Organic chemistry of ejected sediments; (11) Seismoelectric signatures for the determination of depositional parameters; (12) A workflow for the processing and imaging of Reflexion seismic data with CRS attributes; (13) Detection of altitude variations during production of natural gas or petroleum in the area of the San Jorge Basin by means of satellite radar interferometry; (14) (S)PWD - Development of a high resolution system for seismic exploratory work in the deep drilling; (15) Development of a discontinuum mechanics based computer algorithm in the FDM program FLAC3D for Frac dispersion in tigt gas reservoirs; (16) A fresh

  16. Multielement Determination in Fruit, Soaps and Coffee of Pistacia Terebinthus L. by ICP-OES

    OpenAIRE

    KARACAN, Mehmet SAYIM; ÇAĞRAN, Fatma

    2009-01-01

    Multielement analyses were carried out on whole fruit, soaps, gummy extract, and fresh infusions of Pistacia terebinthus using the ICP OES technique. Digestion processes were optimized in a microwave oven. Qualitatively, the elements Al, As, B, Ba, Bi, Ca, Cd, Co, Cr, Cu, Fe, Ge, Hg, In, K, La, Li, Mg, Mn, Mo, Na, Ni, P, Pb, Pd, Sb, Sc, Se, Si, Sn, Sr, Te, Ti, V, W, and Zn were found in the fresh fruit. Al, Cd, and Pb levels in the infusions of gummy extract exceeded the upper limits specifie...

  17. Simultaneous determination of trace rare-earth elements in simulated water samples using ICP-OES with TODGA extraction/back-extraction.

    Science.gov (United States)

    Li, FuKai; Gong, AiJun; Qiu, LiNa; Zhang, WeiWei; Li, JingRui; Liu, Yu; Liu, YuNing; Yuan, HuiTing

    2017-01-01

    The determination of trace rare-earth elements (REEs) can be used for the assessment of environmental pollution, and is of great significance to the study of toxicity and toxicology in animals and plants. N, N, N', N'-tetraoctyl diglycolamide (TODGA) is an environmental friendly extractant that is highly selective to REEs. In this study, an analytical method was developed for the simultaneous determination of 16 trace REEs in simulated water samples by inductively coupled plasma optical emission spectroscopy (ICP-OES). With this method, TODGA was used as the extractant to perform the liquid-liquid extraction (LLE) sample pretreatment procedure. All 16 REEs were extracted from a 3 M nitric acid medium into an organic phase by a 0.025 M TODGA petroleum ether solution. A 0.03 M ethylenediaminetetraacetic acid disodium salt (EDTA) solution was used for back-extraction to strip the REEs from the organic phase into the aqueous phase. The aqueous phase was concentrated using a vacuum rotary evaporator and the concentration of the 16 REEs was detected by ICP-OES. Under the optimum experimental conditions, the limits of detection (3σ, n = 7) for the REEs ranged from 0.0405 ng mL-1 (Nd) to 0.5038 ng mL-1 (Ho). The relative standard deviations (c = 100 ng mL-1, n = 7) were from 0.5% (Eu) to 4.0% (Tm) with a linear range of 4-1000 ng mL-1 (R2 > 0.999). The recoveries of 16 REEs ranged from 95% to 106%. The LLE-ICP-OES method established in this study has the advantages of simple operation, low detection limits, fast analysis speed and the ability to simultaneously determine 16 REEs, thereby acting as a viable alternative for the simultaneous detection of trace amounts of REEs in water samples.

  18. Antibacterial properties of palladium nanostructures sputtered on polyethylene naphthalate

    Czech Academy of Sciences Publication Activity Database

    Polívková, M.; Válová, M.; Siegel, J.; Rimpelová, S.; Hubáček, Tomáš; Lyutakov, O.; Švorčík, V.

    2015-01-01

    Roč. 5, č. 90 (2015), s. 73767-73774 ISSN 2046-2069 Institutional support: RVO:60077344 Keywords : polymer * palladium sputtering * annealing * nanostructure * antibacterial effect Subject RIV: JJ - Other Materials Impact factor: 3.289, year: 2015

  19. Sputter-Resistant Materials for Electric Propulsion, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — This SBIR Phase 2 project shall develop sputter-resistant materials for use in electric propulsion test facilities and for plume shields on spacecraft using electric...

  20. Development of ion beam sputtering techniques for actinide target preparation

    International Nuclear Information System (INIS)

    Aaron, W.S.; Zevenbergen, L.A.; Adair, H.L.

    1985-01-01

    Ion beam sputtering is a routine method for the preparation of thin films used as targets because it allows the use of minimum quantity of starting material, and losses are much lower than most other vacuum deposition techniques. Work is underway in the Isotope Research Materials Laboratory (IRML) at ORNL to develop the techniques that will make the preparation of actinide targets up to 100 μg/cm 2 by ion beam sputtering a routinely available service from IRML. The preparation of the actinide material in a form suitable for sputtering is a key to this technique, as is designing a sputtering system that allows the flexibility required for custom-ordered target production. At present, development work is being conducted on low-activity in a bench-top system. The system will then be installed in a hood or glove box approved for radioactive materials handling where processing of radium, actinium, and plutonium isotopes among others will be performed. (orig.)

  1. Sputter deposition of metallic thin film and directpatterning

    Energy Technology Data Exchange (ETDEWEB)

    Ji, L.; Chen, Y.; Jiang, X.; Ji, Q.; Leung, K.-N.

    2005-09-09

    A compact apparatus is developed for deposition of metal thin film. The system employs an RF discharge plasma source with a straight RF antenna, which is made of or covered with deposition material, serving as sputtering target at the same time. The average deposition rate of copper thin film is as high as 450nm/min. By properly allocating the metal materials on the sputtering antenna, mixture deposition of multiple metal species is achieved. Using an ion beam imprinting scheme also taking advantage of ion beam focusing technique, two different schemes of direct patterning deposition process are developed: direct depositing patterned metallic thin film and resistless ion beam sputter patterning. Preliminary experiments have demonstrated direct pattern transfer from a template with feature size of micro scale; patterns with more than 10x reduction are achieved by sputtering patterning method.

  2. Selected problems with boron determination in water treatment processes. Part I: comparison of the reference methods for ICP-MS and ICP-OES determinations.

    Science.gov (United States)

    Kmiecik, Ewa; Tomaszewska, Barbara; Wątor, Katarzyna; Bodzek, Michał

    2016-06-01

    The aim of the study was to compare the two reference methods for the determination of boron in water samples and further assess the impact of the method of preparation of samples for analysis on the results obtained. Samples were collected during different desalination processes, ultrafiltration and the double reverse osmosis system, connected in series. From each point, samples were prepared in four different ways: the first was filtered (through a membrane filter of 0.45 μm) and acidified (using 1 mL ultrapure nitric acid for each 100 mL of samples) (FA), the second was unfiltered and not acidified (UFNA), the third was filtered but not acidified (FNA), and finally, the fourth was unfiltered but acidified (UFA). All samples were analysed using two analytical methods: inductively coupled plasma mass spectrometry (ICP-MS) and inductively coupled plasma optical emission spectrometry (ICP-OES). The results obtained were compared and correlated, and the differences between them were studied. The results show that there are statistically significant differences between the concentrations obtained using the ICP-MS and ICP-OES techniques regardless of the methods of sampling preparation (sample filtration and preservation). Finally, both the ICP-MS and ICP-OES methods can be used for determination of the boron concentration in water. The differences in the boron concentrations obtained using these two methods can be caused by several high-level concentrations in selected whole-water digestates and some matrix effects. Higher concentrations of iron (from 1 to 20 mg/L) than chromium (0.02-1 mg/L) in the samples analysed can influence boron determination. When iron concentrations are high, we can observe the emission spectrum as a double joined and overlapping peak.

  3. Grafting of Gold Nanoparticles on Glass Using Sputtered Gold Interlayers

    OpenAIRE

    Kvítek, Ondřej; Hendrych, Robin; Kolská, Zdeňka; Švorčík, Václav

    2014-01-01

    Three-step preparation of nanostructured Au layer on glass substrate is described. The procedure starts with sputtered gold interlayer, followed by grafting with dithiols and final coverage with gold nanoparticles (AuNPs). Successful binding of dithiols on the sputtered Au film was confirmed by X-ray photoelectron spectroscopy measurement. AuNPs bound to the surface were observed using atomic force microscopy. Both single nanoparticles and their aggregates were observed. UV-Vis spectra show b...

  4. CO2 gas sensitivity of sputtered zinc oxide thin films

    Indian Academy of Sciences (India)

    TECS

    Abstract. For the first time, sputtered zinc oxide (ZnO) thin films have been used as a CO2 gas sensor. Zinc oxide thin films have been synthesized using reactive d.c. sputtering method for gas sensor applications, in the deposition temperature range from 130–153°C at a chamber pressure of 8⋅5 mbar for 18 h. Argon and ...

  5. Sputtering of Thick Deuterium Films by KeV Electrons

    DEFF Research Database (Denmark)

    Thestrup Nielsen, Birgitte; Svendsen, Winnie Edith; Schou, Jørgen

    1994-01-01

    Sputtering of thick films of solid deuterium up to several μm by keV electrons is reported for the first time. The sputtering yield increases within a narrow range of thicknesses around 1.6 μm by about 2 orders of magnitude for 1.5 keV electrons. A similar behavior has not been observed for ion...... bombardment. The yield enhancement is accompanied by an increasing electron accumulation in the film....

  6. Dependence of Au- production upon the target work function in a plasma-sputter-type negative ion source

    International Nuclear Information System (INIS)

    Okabe, Yushirou; Sasao, Mamiko; Fujita, Junji; Yamaoka, Hitoshi; Wada, Motoi.

    1991-01-01

    A method to measure the work function of the target surface in a plasma-sputter-type negative ion source has been developed. The method can determine the work function by measuring the photoelectric current induced by two lasers (He-Ne, Ar + laser). The dependence of Au - production upon the work function of the target surface in the ion source was studied using this method. The time variation of the target work function and Au - production rate were measured during the cesium coverage decrease due to the plasma ion sputtering. The observed minimum work function of a cesiated gold surface in an Ar plasma was 1.3 eV. At the same time, the negative ion production rate (Au - current/target current) took the maximum value. The negative ion production rate indicated the same dependence on the incident ion energy as that of the sputtering rate when the work function was constant. (author)

  7. The Fabrication of Flow Field Plates for Direct Methanol Fuel Cell Using Lithography and Radio Frequency Sputtering.

    Science.gov (United States)

    Chang, Ho; Kao, Mu-Jung; Chen, Chih-Hao; Cho, Kun-Ching; Hsu, Chun-Yao; Chen, Zhi-Lun

    2015-08-01

    This study uses lithography to etch flow fields on a single side of a printed circuit board (PCB) and combines a flow field plate with a collector plate to make innovative anode flow field plates and cathode flow field plates for a direct methanol fuel cell (DMFC). TiO2 thin film is also sputtered on the anode flow field plate using radio frequency (RF) sputtering. The experimental results show that the prepared DMFC has a better maximum power density of 11.928 mW/cm2. Furthermore, when a TiO2 thin film is sputtered on the flow field plate of the assembled DMFC, the maximum power density is 14.426 mW/cm2, which is actually 21% more than that for a DMFC with no TiO2 thin film coated on the flow field plate.

  8. [Determination of tungsten and cobalt in the air of workplace by ICP-OES].

    Science.gov (United States)

    Zhang, J; Ding, C G; Li, H B; Song, S; Yan, H F

    2017-08-20

    Objective: To establish the inductively coupled plasma optical emission spectrometry (ICP-OES) method for determination of cobalt and tungsten in the air of workplace. Methods: The cobalt and tungsten were collected by filter membrane and then digested by nitric acid, inductively coupled plasma optical emission spectrometry (ICP-OES) was used for the detection of cobalt and tungsten. Results: The linearity of tungsten was good at the range of 0.01-1 000 μg/ml with a correlation coefficient of 0.999 9, the LOD and LOQ were 0.006 7 μg/ml and 0.022 μg/ml, respectively. The recovery was ranged from 98%-101%, the RSD of intra-and inter-batch precision were 1.1%-3.0% and 2.1%-3.8%, respectively. The linearity of cobalt was good at the range of 0.01-100 μg/ml with a correlation coefficient of 0.999 9, the LOD and LOQ were 0.001 2 μg/ml and 0.044 μg/ml, respectively. The recovery was ranged from 95%-97%, the RSD of intra-and inter-batch precision were 1.1%-2.4% and 1.1%-2.9%, respectively. The sampling efficiency of tungsten and cobalt were higher than 94%. Conclusion: The linear range, sensitivity and precision of the method was suitable for the detection of tungsten and cobalt in the air of workplace.

  9. [Determination of 22 inorganic elements in different parts of Lantana camara by ICP-OES].

    Science.gov (United States)

    Zhou, Wei-ming; Wang, Ru-yi; Chen, Liu-sheng; Huang, Chuan-bin

    2014-10-01

    To determine the contents of 22 inorganic elements in different parts of Lantana camara by inductively coupled plasma optical emission spectroscopy (ICP-OES). HNO3-H2O2 digested system was used to completely decompose the organic compounds effectually by microwave digestion. The 22 inorganic elements such as K, Ca, Mg, Fe, Al, Na, Zn, Mn and Cr were determined by ICP-OES under set up working conditions. The contents of K, Ca and Mg were the most in different parts of Lantana camara; The contents of K, Ca, Mg, Mn, Sr and Cu in the leaf were more those that in the root and branch; The contents of Fe, Na, Cr and Ni in the root were more than those in the leaf and branch; The contents of Mn, Zn, Sr and Cu in the branch were more than those in the root and the leaf; The contents of Pb and Cd were higher than the national standard and Cr had high content in different parts of Lantana camara. The determination method is quick, easy and accurate with high sensitivity, which can determine the contents of 22 inorganic elements accurately in different parts of Lantana camara.

  10. Co-sputtering deposition of Cu doped SnS thin films for photovoltaic application: Phase stability, microstructure and optical properties

    Science.gov (United States)

    Baby, Benjamin Hudson; Mohan, D. Bharathi

    2017-06-01

    Cu doped SnS films were successfully fabricated using co-sputtering technique for the first time with the substrate temperature of 400 °C. Cu doping percentage is controlled by varying the dc sputtering voltage from 225V to 325V. The phase formation, surface morphology and optical properties of Cu doped SnS films were studied using X-ray diffraction, confocal Raman spectrometer, atomic force microscope and UV-Vis-NIR spectrophotometer. Structural analysis confirmed the formation of Cu doped SnS films for low dc sputtering voltage while by increasing the sputtering voltage to 325V leads to the semiconductor to metallic transition of the films as evident from optical properties.

  11. In situ trapping of As, Sb and Se hydrides on nanometer-sized ceria-coated iron oxide-silica and slurry suspension introduction to ICP-OES.

    Science.gov (United States)

    Dados, A; Kartsiouli, E; Chatzimitakos, Th; Papastephanou, C; Stalikas, C D

    2014-12-01

    A procedure is developed for the analysis of sub-μg L(-1) levels of arsenic, antimony and selenium after preconcentration of their hydrides. The study highlights the capability of an aqueous suspension of a nanometer-sized magnetic ceria, in the presence of iodide, to function as a sorbent for the in situ trapping and preconcentration of the hydrides of certain metalloids. After extraction, the material is magnetically separated from the trapping solution and analyzed. A slurry suspension sampling approach with inductively coupled plasma-optical emission spectrometry (ICP-OES) is employed for measurements, as the quantitative elution of the adsorbed metalloids is not feasible. The whole analytical procedure consists of five steps: (i) pre-reduction of As, Sb and Se, (ii) generation of the hydrides AsH3, SbH3 and SeH2, (iii) in situ collection in the trapping suspension of magnetic ceria, (iv) isolation of the particles by applying a magnetic field, and (v) measurement of As, Sb and Se concentrations using ICP-OES. Under the established experimental conditions, the efficiency of trapping accounted for 94 ± 2%, 89 ± 2% and 98 ± 3% for As, Sb and Se, respectively, signifying the effective implementation of the overall procedure. The applicability of the procedure has been demonstrated by analyzing tap and lake water and a reference material (soft drinking water). The obtained analytical figures of merit were satisfactory for the analysis of the above metalloids in natural waters by ICP-OES. Copyright © 2014 Elsevier B.V. All rights reserved.

  12. Simple model of surface roughness for binary collision sputtering simulations

    International Nuclear Information System (INIS)

    Lindsey, Sloan J.; Hobler, Gerhard; Maciążek, Dawid; Postawa, Zbigniew

    2017-01-01

    Highlights: • A simple model of surface roughness is proposed. • Its key feature is a linearly varying target density at the surface. • The model can be used in 1D/2D/3D Monte Carlo binary collision simulations. • The model fits well experimental glancing incidence sputtering yield data. - Abstract: It has been shown that surface roughness can strongly influence the sputtering yield – especially at glancing incidence angles where the inclusion of surface roughness leads to an increase in sputtering yields. In this work, we propose a simple one-parameter model (the “density gradient model”) which imitates surface roughness effects. In the model, the target’s atomic density is assumed to vary linearly between the actual material density and zero. The layer width is the sole model parameter. The model has been implemented in the binary collision simulator IMSIL and has been evaluated against various geometric surface models for 5 keV Ga ions impinging an amorphous Si target. To aid the construction of a realistic rough surface topography, we have performed MD simulations of sequential 5 keV Ga impacts on an initially crystalline Si target. We show that our new model effectively reproduces the sputtering yield, with only minor variations in the energy and angular distributions of sputtered particles. The success of the density gradient model is attributed to a reduction of the reflection coefficient – leading to increased sputtering yields, similar in effect to surface roughness.

  13. Application of torsion vacuum microbalance to sputtering yield measurement

    International Nuclear Information System (INIS)

    Akaishi, Kenya; Miyahara, Akira; Sukenobu, Satoru; Komizo, Mutsuo.

    1977-01-01

    The torsion vacuum microbalance technique useful for the determination of the sputtering yield of wall materials for fusion reactors was developed. In order to measure the rate of weight change of the samples during sputtering continuously, it is very important to keep the null point drift of the microbalance as small as possible. The deflection angle of the balance beam was detected and amplified by optical lever, and was transformed to electrical output by linear photopotentiometer. The null point drift wave mainly caused by temperature change in the laboratory, which induced relative displacement by thermal expansion between the balance system and the optical measuring system. The drift was reduced less than the equivalent weight of 4 x 10 -7 g/hr when the balance system wosset in the thermostat kept at 20 +- 0.5 0 C. The sensitivity of the balance was 8.3 x 10 -7 g/mV. The microbalance technique developed was applied to the measurement of sputtering yield of Cu by Ar + . The measurement was carried out with Ar + ion energy of 0.2 -- 2 keV, beam current of 0.5 -- 1.5 μA, and sputtering time of 2 hrs. The initial weight of Cu sample was 0.4g (15 mm x 15 mm sheet) and the sample temperature during sputtering was about 120 0 C. The sputtering yields obtained show good agreement with the results reported by Wehner et al. (auth.)

  14. Highly-enhanced reflow characteristics of sputter deposited Cu interconnections of large scale integrated devices by optimizing sputtering conditions

    Science.gov (United States)

    Onishi, Takashi; Mizuno, Masao; Yoshikawa, Tetsuya; Munemasa, Jun; Mizuno, Masataka; Kihara, Teruo; Araki, Hideki; Shirai, Yasuharu

    2013-07-01

    Improving the reflow characteristics of sputtered Cu films was attempted by optimizing the sputtering conditions. The reflow characteristics of films deposited under various sputtering conditions were evaluated by measuring their filling level in via holes. It was found that the reflow characteristics of the Cu films are strongly influenced by the deposition parameters. Deposition at low temperatures and the addition of H2 or N2 to the Ar sputtering gas had a significant influence on the reflow characteristics. Imperfections in the Cu films before and after the high-temperature, high-pressure treatments were investigated by positron annihilation spectroscopy. The results showed that low temperature and the addition of H2 or N2 led to films containing a large number of mono-vacancies, which accelerate atomic diffusion creep and dislocation core diffusion creep, improving the reflow characteristics of the Cu films.

  15. Carbon and tungsten effect on characteristics of sputtered and re-deposited beryllium target layers under deuteron bombardment

    International Nuclear Information System (INIS)

    Danelyan, L.S.; Gureev, V.M.; Elistratov, N.G.

    2004-01-01

    The behavior of the plasma facing Be-elements in the International Thermonuclear Experimental Reactor ITER will be affected by the re-deposition of other eroded plasma facing materials. The effect of carbon- and tungsten-additions on the microstructure, chemical composition and hydrogen isotope accumulation in the sputtered and re-deposited layers of beryllium TGP-56 at its interaction with 200 - 300 eV hydrogen isotope ions was studied in the MAGRAS facility equipped with a magnetron sputtering system. (author)

  16. Portuguese Version of the EORTC QLQ-OES18 and QLQ-OG25 for Health-Related Quality of Life Assessment.

    Science.gov (United States)

    Relvas-Silva, Miguel; Silva, Rui Almeida; Dinis-Ribeiro, Mário

    2017-01-31

    Health-related quality of life assessment is increasingly important as it can help both clinical research and care for patients, particularly among oncological patients. Quality of Life Questionnaire - OES18 (esophageal module) and Quality of Life Questionnaire - OG25 (esophagogastric module) are the European Organization for Research and Treatment of Cancer modules for the evaluation of quality of life in patients with esophageal and esophagogastric cancers, respectively. The aim of our study was to translate, to culturally adapt and to perform a pilot testing to create the Portuguese version of both questionnaires. The European Organization for Research and Treatment of Cancer guidelines were followed for translation, cultural adaptation and pilot testing of Quality of Life Questionnaire - OES18 (esophageal module) and Quality of Life Questionnaire - OG25 (esophagogastric module). The Quality of Life Questionnaire - OG25 (esophagogastric module) went through a process of forward (English → Portuguese) and backward (Portuguese → English) translation, by independent native speaker translators. After review, a preliminary version was created to be pilot tested among Portuguese patients. As a Brazilian version was already available for Quality of Life Questionnaire - OES18 (esophageal module), the questionnaire was simply culturally adapted and pilot tested. Both cancer and non-cancer patients were included. Overall, 30 patients completed the Portuguese version of each questionnaire. Afterwards, a structured interview was conducted to find and report any problematic items. Troublesome items and wording were changed according to the pilot testing results. The final versions were sent to the European Organisation for Research and Treatment of Cancer Quality of Life Group and approved. The Portuguese versions of the European Organization for Research and Treatment of Cancer Quality of Life Questionnaire - OES18 (esophageal module) and OG25

  17. Estimates of Sputter Yields of Solar-Wind Heavy Ions of Lunar Regolith Materials

    Science.gov (United States)

    Barghouty, Abdulmasser F.; Adams, James H., Jr.

    2008-01-01

    At energies of approximately 1 keV/amu, solar-wind protons and heavy ions interact with the lunar surface materials via a number of microscopic interactions that include sputtering. Solar-wind induced sputtering is a main mechanism by which the composition of the topmost layers of the lunar surface can change, dynamically and preferentially. This work concentrates on sputtering induced by solar-wind heavy ions. Sputtering associated with slow (speeds the electrons speed in its first Bohr orbit) and highly charged ions are known to include both kinetic and potential sputtering. Potential sputtering enjoys some unique characteristics that makes it of special interest to lunar science and exploration. Unlike the yield from kinetic sputtering where simulation and approximation schemes exist, the yield from potential sputtering is not as easy to estimate. This work will present a preliminary numerical scheme designed to estimate potential sputtering yields from reactions relevant to this aspect of solar-wind lunar-surface coupling.

  18. Nanoscale patterns produced by self-sputtering of solid surfaces: The effect of ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Bradley, R. Mark [Department of Physics, Colorado State University, Fort Collins, Colorado 80523 (United States); Hofsäss, Hans [II. Physikalisches Institut, Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen (Germany)

    2016-08-21

    A theory of the effect that ion implantation has on the patterns produced by ion bombardment of solid surfaces is introduced. For simplicity, the case of self-sputtering of an elemental material is studied. We find that implantation of self-ions has a destabilizing effect along the projected beam direction for angles of incidence θ that exceed a critical value. In the transverse direction, ion implantation has a stabilizing influence for all θ.

  19. Structure formation upon reactive direct current magnetron sputtering of transition metal oxide films

    International Nuclear Information System (INIS)

    Ngaruiya, J.M.; Kappertz, O.; Mohamed, S.H.; Wuttig, M.

    2004-01-01

    A comparative study of reactive direct current magnetron sputtering for different transition metal oxides reveals crystalline films at room temperature for group 4 and amorphous films for groups 5 and 6. This observation cannot be explained by the known growth laws and is attributed to the impact of energetic particles, originating from the oxidized target, on the growing film. This scenario is supported by measured target characteristics, the evolution of deposition stress of the films, and the observed backsputtering

  20. Pressureless Bonding Using Sputtered Ag Thin Films

    Science.gov (United States)

    Oh, Chulmin; Nagao, Shijo; Suganuma, Katsuaki

    2014-12-01

    To improve the performance and reliability of power electronic devices, particularly those built around next-generation wide-bandgap semiconductors such as SiC and GaN, the bonding method used for packaging must change from soldering to solderless technology. Because traditional solders are problematic in the harsh operating conditions expected for emerging high-temperature power devices, we propose a new bonding method in this paper, namely a pressureless, low-temperature bonding process in air, using abnormal grain growth on sputtered Ag thin films to realize extremely high temperature resistance. To investigate the mechanisms of this bonding process, we characterized the microstructural changes in the Ag films over various bonding temperatures and times. We measured the bonding properties of the specimens by a die-shear strength test, as well as by x-ray diffraction measurements of the residual stress in the Ag films to show how the microstructural developments were essential to the bonding technology. Sound bonds with high die strength can be achieved only with abnormal grain growth at optimum bonding temperature and time. Pressureless bonding allows for production of reliable high-temperature power devices for a wide variety of industrial, energy, and environmental applications.

  1. Sputtered Layered Synthetic Microstruture (LSM) Dispersion Elements

    Science.gov (United States)

    Barbee, Troy W.

    1981-10-01

    The opportunities offered by engineered synthetic multilayer dispersion elements for x-rays have been recognized since the earliest days of x-ray diffraction analysis. In this paper, application of sputter deposition tehnology to the synthesis of Layered Synthetic Microstructure (LSM's) of sufficient quality or use as x-ray dispersion elements is discussed. It will be shown that high efficiency, controllble bandwidth dispersion elements, with d spacings varying from 15 Å to 180 Å, may be synthesized onto both mechanically stiff and flexible substrtes. Multilayer component materials include tungten, niobium, molybdenum, titanium, vanadium, and silicon layers separated by carbon layers. Experimental observations of peak reflectivity in first order, integrated reflectivity in first order, and diffraction performance at selected photon energies in the range, 100 to 15000 eV, will be reported and compared to theory. Emphasis is placed on results giving information concerning limiting structural characteristics of these LSM's. It will be shown that the observed behavior is in accord with theory, both kinematic and dynamic regimes being clearly observed. In addition, the mosaic spread of these LSM's is not detectable, indicatig that they are perfect structures. A consistent explanation of these experimental results indicates that roughness at the interfaces between constituent layers is the structural characteristic currently limiting diffracting behavior.

  2. How surface roughness affects the angular dependence of the sputtering yield

    International Nuclear Information System (INIS)

    Hu, A.; Hassanein, A.

    2012-01-01

    Comprehensive model is developed to study the impact of surface roughness on the angular dependence of sputtering yield. Instead of assuming surfaces to be flat or composed of exact self-similar fractals, we developed a new method to describe the surfaces. Random fractal surfaces generated by midpoint displacement algorithm in computer graphics area and Support vector machine algorithm in pattern recognition area are combined with the Monte Carlo ion bombardment simulation code, i.e., Ion Transport in Materials and Compounds (ITMC) code . With this new fractal version of ITMC-F, we successfully simulated the angular dependence of sputtering yield for various ion-target combinations. Examples are given for 5 keV Ar ions bombarding iron, graphite, and silicon surfaces, with the input surface roughness exponent directly depicted from experimental data. Comparison is made with previous models to account for surface roughness and recent experimental data. The ITMC-F code showed good agreement with the experimental data.

  3. Synthesis and Characterization of Zn O Thin Films Produced by Reactive RF Sputter

    International Nuclear Information System (INIS)

    Korkmaz, S.

    2008-01-01

    In this study, Zn O thin films were produced by reactive RF sputtering with different oxygen and argon contents. Zn O thin films were growth from Zn target particles. This system needs a working gas in order to generate oxidation process using reactive RF sputter. Working gas is symbolized with (100-X)%Ar+ X % O 2 gas mixing; which X is the O 2 contents and it's percentage were 5,10,15 and 20 in used Ar-O 2 gas mixing. Some analyses were realized in order to characterization of Zn O thin films. Thickness (during the growth), refractive index, band-gap energy; absorption spectra were carried out using optical method

  4. Estimation of the reduction of sputtering for fusion grade materials after disappearance of the Debye sheath

    Science.gov (United States)

    Adhikari, S.; Moulick, R.; Goswami, K. S.

    2018-02-01

    The effect of grazing angle on a solid surface (divertor) erosion due to ion sputtering is studied by 1D-3V fluid approach. For an oblique magnetic field, there exists a region in front of the solid surface called Chodura sheath (CS). It is assumed that the CS is additive to the Debye sheath (DS). For a certain value of the grazing angle, it has been observed that the DS vanishes and the entire potential drop occurs across the CS. This new analysis of the event provides some facts of pragmatic importance in improving the solutions of edge impurity codes. Important factors, such as ion energy, impact angle for physical sputtering are highlighted. The dependence of these two parameters on the grazing angle is also investigated in detail.

  5. Angular distributions of sputtered particles from lithium-implanted aluminium and copper crystals

    International Nuclear Information System (INIS)

    Johansen, A.; Johnson, E.; Sarholt-Kristensen, L.; Steenstrup, S.; Andersen, H.H.; Buhanov, V.M.; Chernysh, V.S.; Ivanov, I.N.; Minnebaev, K.F.

    1991-01-01

    The anisotropy of angular distributions of sputtered ions from lithium implanted aluminium and copper single crystals, measured by SIMS analysis, have been used to obtain information about the microstructure of the implanted layers. Sputtered Al + distributions from the {111} surface show three-fold symmetry with maximum intensity near the and directions respectively, while Li + distributions show maximum intensity only in the directions. From {100} crystals the Al + distributions have four-fold symmetry while there are no preferential ejection directions for the Li + ions. This agrees conceptually with the fact that the implanted layer contains the ordered Al 3 Li (δ') phase, which has earlier been observed by TEM analysis on implanted samples. In contrast, a similar study of Li + implanted copper crystals shows that the implanted lithium is randomly located. (orig.)

  6. Small cluster ions from source of negative ions by cesium sputtering

    CERN Document Server

    Wang, X M; Shao, L; Liu, J R; Chu, W K

    2002-01-01

    We investigated the delivery of small cluster ions using a source of negative ions by cesium sputtering (SNICS). The negative cluster ions of B sub n , C sub n , Si sub n , Co sub n , Cu sub n , Ge sub n , Au sub n , GeB sub n and SiB sub n have been extracted by SNICS. Adequate beam current of some small clusters was obtained by changing several parameters for cluster ion yield. After a comprehensive study of the operation parameters, such as target material selection, target geometry, sputtering voltage and current, the small cluster ion current can be increased by several orders of magnitude, with little change on the monomer ion yield.

  7. Improving depth resolutions in positron beam spectroscopy by concurrent ion-beam sputtering

    Science.gov (United States)

    John, Marco; Dalla, Ayham; Ibrahim, Alaa M.; Anwand, Wolfgang; Wagner, Andreas; Böttger, Roman; Krause-Rehberg, Reinhard

    2018-05-01

    The depth resolution of mono-energetic positron annihilation spectroscopy using a positron beam is shown to improve by concurrently removing the sample surface layer during positron beam spectroscopy. During ion-beam sputtering with argon ions, Doppler-broadening spectroscopy is performed with energies ranging from 3 keV to 5 keV allowing for high-resolution defect studies just below the sputtered surface. With this technique, significantly improved depth resolutions could be obtained even at larger depths when compared to standard positron beam experiments which suffer from extended positron implantation profiles at higher positron energies. Our results show that it is possible to investigate layered structures with a thickness of about 4 microns with significantly improved depth resolution. We demonstrated that a purposely generated ion-beam induced defect profile in a silicon sample could be resolved employing the new technique. A depth resolution of less than 100 nm could be reached.

  8. ZIF-8 Membranes with Improved Reproducibility Fabricated from Sputter-Coated ZnO/Alumina Supports

    KAUST Repository

    Yu, Jian

    2015-11-10

    Zeolitic imidazolate framework-8 (ZIF-8) membrane has shown great potential for propylene/propane separation based on molecular sieving mechanism. Although diverse synthesis strategies were applied to prepare ZIF-8 membranes, it is still a challenge for reproducible fabrication of high-quality membranes. In this study, high-quality ZIF-8 membranes were prepared through hydrothermal synthesis under the partial self-conversion of sputter-coated ZnO layer on porous α-alumina supports. The reproducibility was significantly improved, compared with that from sol-gel coated ZnO layer, due to the highly controllable sputtering deposition of ZnO precursor. The relationship between the quality of as-synthesized membrane and amount of deposited ZnO was also determined. The effect of pressure drop in C3H6/C3H8 separation on separating performance was also examined.

  9. Influence of the microstructure on the corrosion behavior of magnetron sputter-quenched amorphous metallic alloys

    Science.gov (United States)

    Thakoor, A. P.; Khanna, S. K.; Williams, R. M.; Landel, R. F.

    1983-01-01

    The microstructure and corrosion behavior of magnetron sputter deposited amorphous metallic films of (Mo6ORu40)82B18 under varying sputtering atmospheres have been investigated. The microstructural details and topology of the films have been studied by scanning electron microscopy and correlated with the deposition conditions. By reducing the pressure of pure argon gas, the characteristic features of rough surface and columnar growth full of vertical voids can be converted into a mirror-smooth finish with very dense deposits. Films deposited in the presence of O2 or N2 exhibit columnar structure with vertical voids. Film deposited in pure argon at low pressure show remarkably high corrosion resistance due to the formation of a uniform passive surface layer. The influence of the microstructure and surface texture on the corrosion behavior is discussed.

  10. Effect of sputtered flux direction on damping properties in magnetic bilayers

    Science.gov (United States)

    Nayak, Sagarika; Mallick, Sougata; Bhusan Singh, Braj; Bedanta, Subhankar

    2018-02-01

    We deposited Co40Fe40B20 (hard)/Co (soft) bilayers by varying the direction of the substrate relative to the line of impinging flux of sputtered atoms of the constituent layers. We have chosen two orientations in which the angle between the sputter flux for Co40Fe40B20 and Co layers are 0° (parallel-configuration) and 90° (perpendicular-configuration) with respect to each other. Domain imaging and the dynamic magnetic properties have been studied by performing magneto-optic Kerr effect based microscopy and ferromagnetic resonance spectroscopy, respectively. Kerr microscopy revealed that magnetic domains for the bilayers grown in different configurations exhibit a cumulative effect of the domain structure of both the single layers. However, we found that the damping constant α for the bilayers grown in the parallel-configuration exhibit lower damping as compared to the corresponding sample grown under the perpendicular-configuration.

  11. Quantification of Selected Trace and Mineral Elements in Royal Jelly from Bulgaria by Icp-Oes and Etaas

    Directory of Open Access Journals (Sweden)

    Balkanska Ralitsa

    2017-12-01

    Full Text Available The objective of the present study was to investigate selected trace and mineral elements in Royal Jelly (RJ from Bulgaria. A total of 30 RJ samples were included in the study. The analytical procedure consisted of the microwave digestion of the RJ samples with nitric acid followed by instrumental measurement. Concentrations of Al, Ba, Ca, Cr, Cu, Fe, K, Mg, Mn, Na, P, Sr and Zn were determined using inductively coupled plasma optical emission spectroscopy (ICP-OES, while As, Cd, Co, Ni and Pb were determined by electrothermal atomic absorption spectrometry (ETAAS. Our results showed that elements K, Mg, Ca represented 96% from the total mineral content of the RJ samples from Bulgaria, while the most abundant trace element was Na, followed by Zn. The elements Ba, Cr, Cu, Fe, Mn and Sr were found in trace concentration levels and elements As, Pb, Cd, Co and Ni in microconcentration levels. Selected mineral and trace elements were found in relatively constant concentration levels in all of the analyzed RJ samples. It was concluded that chemical element content did not depend on geographical origin and was under homeostatic adjustment in RJs.

  12. Properties of a-Si sub(x) C sub(y) F sub(z) thin films prepared by reactive sputtering in CF4

    International Nuclear Information System (INIS)

    Saito, Nobuo; Yamaguchi, Tomuo

    1982-01-01

    The proprties of amorphous Sisub(x)Csub(y)Fsub(z) alloy thin films are studied, which are prepared by reactive rf sputtering of silicon in CF 4 generally used in plasma etching processes, and by co-sputtering of silicon and carbon in CF 4 . As as function of the sputtering partial pressure of CF 4 and the fractional area of carbon for co-sputtering, optical absorption coefficient, IR transmission spectra and the composition of the films are measured. The vibrating mode of chemical bond of CF 2 and C 2 F 6 are dominant for relatively lower value of CF 4 gas pressure. SiC stretching mode becomes predominantly for higher value of CF 4 gas pressure and with increasing the fractional area of carbon for co-sputtering. The optical gap and the content of carbon and fluorine are increased with increasing CF 4 gas pressure. The composition of the films can be controlled using co-sputtering and changing CF 4 gas pressure. (author)

  13. Initial Growth Process of Magnetron Sputtering 321 Stainless Steel Films Observed by Afm

    Science.gov (United States)

    Jin, Yongzhong; Wu, Wei; Liu, Dongliang; Chen, Jian; Sun, Yali

    To investigate the initial morphological evolution of 321 stainless steel (SS) films, we examined the effect of sputtering time on the morphology of 321 SS film. In this study, a group of samples were prepared at nine different sputtering times within 20 s using radio-frequency (r.f.) magnetron sputtering and characterized by atomic force microscopy (AFM). Only globular-like grains were formed on mica substrates within 6 s, whose average grain size is ~ 21-44 nm. Meanwhile, few grains with larger size are subject to settle at the defect sites of mica substrates. At 8 s, we found large columnar crystallites with the average grain size of 61 nm. From 10 to 14 s, islands grew continuously and coalesced in order to form an interconnected structure containing irregular channels or grooves, with a depth of ~ 3.5-5 nm. Up to 16 s, a nearly continuous film was formed and some new globular-like grains were again present on the film. Study of the AFM image at 20 s suggests that the watercolor masking method designed by us is an effective method, by which we can prepare thin films with steps for the measurement of the thickness of continuous thin films. It is also found that the coverage rate of films increases with the increase in sputtering time (from 2 to 16 s). On the other hand, the increase in root mean square (RMS) roughness is much more significant from 6 to 10 s, and there is a maximum value, 2.81 nm at 10 s due to more islands during deposition. However, RMS roughness decreases with the decrease in length and width of channels or grooves from 10 to 16 s. Especially, a lower RMS roughness of 0.73 nm occurs at 16 s, because of the continuous film produced with a large coverage rate of 98.43%.

  14. Comparative determination of uranium in rock phosphates and columbite by ICP-OES, alpha and gamma spectrometry

    International Nuclear Information System (INIS)

    Singhal, R.K.; Sharma, P.K.; Bassan, M.K.T.; Basu, H.; Reddy, A.V.R.

    2011-01-01

    During this work selective separation of uranium from rock phosphate and columbite mineral was done before its quantitative estimation by using Inductively Coupled Plasma Optical Emission Spectrometry (ICP-OES). Uranium from the rock phosphate and columbite was extracted by sodium peroxide fusion followed by leaching in 2 M HNO 3 . To avoid spectral interference in the estimation of uranium by ICP-OES, the selective separation of uranium from the leachate was carried out by using two different extractants, 30% Tributyl Phosphates (TBP) in CCl 4 and a equi-volume mixture of Di(2-ethylhexyl) phosphoric acid (D2EHPA) and TBP in petrofin. Uranium was stripped from the organic phase by using 1 M ammonium carbonate solution. Determination of uranium by ICP-OES was done after dissolving the residue left after evaporation of ammonium carbonate solution in 4% HNO 3 . The concentration of the uranium observed in the rock phosphates samples was 40-200 μg g -1 whereas in columbite samples the concentration range was 100-600 μg g -1 . Uranium concentration evaluated by ICP-OES was complimented by gamma and alpha spectrometry. Concentration of uranium evaluated by gamma spectrometry in case of rock phosphate and columbite was in close agreement with the uranium content obtained by ICP-OES. Uranium determination by alpha spectrometry showed only minor deviation (1-2%) from the results obtained by ICP-OES in case of rock phosphates whereas in case of columbites results are off by 20-30%. (author)

  15. Simultaneous preconcentration and removal of iron, chromium, nickel with N,N'-etylenebis-(ethane sulfonamide) ligand on activated carbon in aqueous solution and determination by ICP-OES.

    Science.gov (United States)

    Karacan, Mehmet Sayim; Aslantaş, Neslihan

    2008-07-15

    In this study, Fe, Cr and Ni have been preconcentrated and removed by using N,N'-ethylenebis (ethane sulfonamide), (ESEN) ligand on activated carbon (AC) in aqueous solution. For this purpose, complexes between these metals and ligands have been investigated and used in preconcentration and removal studies. Factors which have affected adsorption of metals on activated carbon have been optimized. Adsorbed metals have been preconcentrated 10-fold and determined by ICP-OES. Interferences of Ca, Mg and K to this process have been investigated. The proposed method has been applied to the tap water and Ankara Creek water in order to Fe, Cr, and Ni remediation and preconcentration. Determination of metals by ICP-OES has been checked with standard reference material (NIST 1643e). The proposed method provides the recoveries of 87%, 108% and 106% for Fe, Cr and Ni, respectively, in preconcentration. It also provides the removal of Fe, Cr and Ni by 93%, 100% and 100% removal from waters, respectively.

  16. Real-time measurement of size-resolved elemental composition ratio for flame synthesized composite nanoparticle aggregates using a tandem SMPS-ICP-OES.

    Science.gov (United States)

    Reed, Nathan; Fang, Jiaxi; Chavalmane, Sanmathi; Biswas, Pratim

    2017-01-01

    Composite nanoparticles find application in catalysis, drug delivery, and energy storage and require increasingly fine control of their physical properties and composition. While composite nanoparticles have been widely synthesized and characterized, little work has systematically correlated the initial concentration of precursors and the final composition of flame synthesized composite nanoparticles. This relationship is explored in a diffusion flame aerosol reactor by coupling a scanning mobility particle sizer (SMPS) with an inductively coupled plasma optical emission spectrometer (ICP-OES). A framework for studying the relationship between the initial precursor concentrations of different elements and the final nanoparticle composition is explored. The size-resolved elemental composition was measured by directly injecting size-selected fractions of aggregated magnetite and silicon dioxide composite nanoparticles into the ICP-OES plasma. This work showed a correlation between precursor molar ratio and the measured elemental ratio in the mobility size range of 50 to 140 nm. Building on previous work studying size resolved elemental composition of engineered nanoparticles, the analysis is extended to flame synthesized composite nanoparticle aggregates in this work.

  17. Substrate dependent hierarchical structures of RF sputtered ZnS films

    Science.gov (United States)

    Chalana, S. R.; Mahadevan Pillai, V. P.

    2018-05-01

    RF magnetron sputtering technique was employed to fabricate ZnS nanostructures with special emphasis given to study the effect of substrates (quartz, glass and quartz substrate pre-coated with Au, Ag, Cu and Pt) on the structure, surface evolution and optical properties. Type of substrate has a significant influence on the crystalline phase, film morphology, thickness and surface roughness. The present study elucidates the suitability of quartz substrate for the deposition of stable and highly crystalline ZnS films. We found that the role of metal layer on quartz substrate is substantial in the preparation of hierarchical ZnS structures and these structures are of great importance due to its high specific area and potential applications in various fields. A mechanism for morphological evolution of ZnS structures is also presented based on the roughness of substrates and primary nonlocal effects in sputtering. Furthermore, the findings suggest that a controlled growth of hierarchical ZnS structures may be achieved with an ordinary RF sputtering technique by changing the substrate type.

  18. A Summary of the Rendezvous, Proximity Operations, Docking, and Undocking (RPODU) Lessons Learned from the Defense Advanced Research Project Agency (DARPA) Orbital Express (OE) Demonstration System Mission

    Science.gov (United States)

    Dennehy, Cornelius J.; Carpenter, James R.

    2011-01-01

    The Guidance, Navigation, and Control (GN&C) Technical Discipline Team (TDT) sponsored Dr. J. Russell Carpenter, a Navigation and Rendezvous Subject Matter Expert (SME) from NASA's Goddard Space Flight Center (GSFC), to provide support to the Defense Advanced Research Project Agency (DARPA) Orbital Express (OE) rendezvous and docking flight test that was conducted in 2007. When that DARPA OE mission was completed, Mr. Neil Dennehy, NASA Technical Fellow for GN&C, requested Dr. Carpenter document his findings (lessons learned) and recommendations for future rendezvous missions resulting from his OE support experience. This report captures lessons specifically from anomalies that occurred during one of OE's unmated operations.

  19. Evaluation of the rare earth impurities determination in Gd{sub 2}O{sub 3} matrix by ICP OES

    Energy Technology Data Exchange (ETDEWEB)

    Santos, Franciele N.; Silva, Ieda S.; Gomide, Ricardo G.; Oliveira, Luis C., E-mail: franciele.santos@ctmsp.mar.mil.br, E-mail: ieda@ctmsp.mar.mil.br, E-mail: gomide@ctmsp.mar.mil.br, E-mail: luis.claudio@ctmsp.mar.mil.br [Centro Tecnologico da Marinha em Sao Paulo (CEA/LABMAT/CTMSP), Ipero, SP (Brazil). Centro Experimental Aramar. Lab. de Materiais Nucleares

    2013-07-01

    The ternary U-Rare Earth-O systems are involved in the nuclear technology due to their application as burnable poison in PWR type reactors. Chemical and physical characterization of both constituents, uranium dioxide (UO{sub 2}) and gadolinium oxide (Gd{sub 2}O{sub 3}), used in the burnable poison production, has a special interest. Inductively coupled plasma optic emission spectrometry (ICP OES) is suitable for the determination of the rare earth elements (REEs) due to its high sensibility. However, REEs have many spectral emission lines hence most of them suffer from spectral interferences due to other REEs and impurities elements. In this work spectral lines REEs interferences and other impurities elements were investigated in Gd{sub 2}O{sub 3} matrix. The sensibility of each selected line and interference lines were determinated. Detection limits and linearity were presented. Validation of the method was carried out mainly with recovery studied in the Gd{sub 2}O{sub 3} spiked matrix. (author)

  20. Ion Beam Analysis, structure and corrosion studies of nc-TiN/a-Si{sub 3}N{sub 4} nanocomposite coatings deposited by sputtering on AISI 316L

    Energy Technology Data Exchange (ETDEWEB)

    García, J. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, J. Guadalupe Zuno 48, Los Belenes, Zapopan, Jal. 45101 (Mexico); Canto, C.E. [Instituto de Física, UNAM, Avenida de la Investigación S/N, Coyoacán, México, D.F. 04510 (Mexico); Flores, M. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, J. Guadalupe Zuno 48, Los Belenes, Zapopan, Jal. 45101 (Mexico); Andrade, E., E-mail: andrade@fisica.unam.mx [Instituto de Física, UNAM, Avenida de la Investigación S/N, Coyoacán, México, D.F. 04510 (Mexico); Rodríguez, E.; Jiménez, O. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, J. Guadalupe Zuno 48, Los Belenes, Zapopan, Jal. 45101 (Mexico); Solis, C.; Lucio, O.G. de [Instituto de Física, UNAM, Avenida de la Investigación S/N, Coyoacán, México, D.F. 04510 (Mexico); Rocha, M.F. [ESIME-Z, Instituto Politécnico Nacional, ALM Zacatenco, México, D.F. 07738 (Mexico)

    2014-07-15

    In this work, nanocomposite coatings of nc-TiN/a-Si{sub 3}N{sub 4}, were deposited on AISI 316L stainless steel substrate by a DC and RF reactive magnetron co-sputtering technique using an Ar–N{sub 2} plasma. The structure of the coatings was characterized by means of XRD (X-ray Diffraction). The substrate and coating corrosion resistance were evaluated by potentiodynamic polarization using a Ringer solution as electrolyte. Corrosion tests were conducted with the purpose to evaluate the potential of this coating to be used on biomedical alloys. IBA (Ion Beam Analysis) techniques were applied to measure the elemental composition profiles of the films and, XPS (X-ray Photoelectron Spectroscopy) were used as a complementary technique to obtain information about the compounds present in the films. The nanocomposite coatings of nc-TiN/a-Si{sub 3}N{sub 4} show crystalline (TiN) and amorphous (Si{sub 3}N{sub 4}) phases which confer a better protection against the corrosion effects compared with that of the AISI 316L.

  1. Method validation in plasma source optical emission spectroscopy (ICP-OES) - From samples to results

    International Nuclear Information System (INIS)

    Pilon, Fabien; Vielle, Karine; Birolleau, Jean-Claude; Vigneau, Olivier; Labet, Alexandre; Arnal, Nadege; Adam, Christelle; Camilleri, Virginie; Amiel, Jeanine; Granier, Guy; Faure, Joel; Arnaud, Regine; Beres, Andre; Blanchard, Jean-Marc; Boyer-Deslys, Valerie; Broudic, Veronique; Marques, Caroline; Augeray, Celine; Bellefleur, Alexandre; Bienvenu, Philippe; Delteil, Nicole; Boulet, Beatrice; Bourgarit, David; Brennetot, Rene; Fichet, Pascal; Celier, Magali; Chevillotte, Rene; Klelifa, Aline; Fuchs, Gilbert; Le Coq, Gilles; Mermet, Jean-Michel

    2017-01-01

    Even though ICP-OES (Inductively Coupled Plasma - Optical Emission Spectroscopy) is now a routine analysis technique, requirements for measuring processes impose a complete control and mastering of the operating process and of the associated quality management system. The aim of this (collective) book is to guide the analyst during all the measurement validation procedure and to help him to guarantee the mastering of its different steps: administrative and physical management of samples in the laboratory, preparation and treatment of the samples before measuring, qualification and monitoring of the apparatus, instrument setting and calibration strategy, exploitation of results in terms of accuracy, reliability, data covariance (with the practical determination of the accuracy profile). The most recent terminology is used in the book, and numerous examples and illustrations are given in order to a better understanding and to help the elaboration of method validation documents

  2. Trace elemental composition of curry by inductively coupled plasma optical emission spectrometry (ICP-OES).

    Science.gov (United States)

    Gonzálvez, A; Armenta, S; De La Guardia, M

    2008-01-01

    A methodology based on inductively coupled plasma optical emission spectrometry (ICP-OES) after microwave-assisted acid digestion was developed to determine the content of traces elements in curry samples from the Spanish market. The methodology was validated in terms of accuracy by the analysis of citrus and tomato leaf reference materials achieving comparable results with the certified values. The trace metal content of curry samples was compared with data available from previously published reports concerning Indian samples, especially in terms of heavy metal composition, in order to guarantee the quality of the commercially available spices in the European countries. Values found for the analysis of arsenic, lead and cadmium were significantly lower than the maximum limit allowed by European Union statutory limits for heavy metals and lower than those obtained for Indian curry leaves reported by Indian research teams by using neutron activation and γ-ray analysis.

  3. Deposition of thin films by magnetron sputtering molybdenum in samples of pure copper; Deposicao de filmes finos de molibdenio por magnetron sputtering em amostra de cobre puro

    Energy Technology Data Exchange (ETDEWEB)

    Ferreira, N.M.; Almeida, E.O. de; Alves Junior, C. [Universidade Federal do Rio Grande do Norte, Campus Universitario Lagoa Nova, PPGCEM - Natal, RN (Brazil); Lourenco, J.M. [Instituto Federal de Educacao, Ciencias e Tecnologia do Rio Grande do Norte (IFRN), Natal, RN (Brazil)

    2010-07-01

    The deposition surface is a process of thermochemical treatment, which involves the deposition of a thin film usually about one to two microns on a metallic substrate, which constitutes one of the most important surface engineering techniques. The plasma deposition process with the configuration of magnetron sputtering it is removing material from a solid surface (target) through the impact of energetic particles from plasma. The aim of this study is to characterize the microstructure of the material under study using the techniques of optical microscopy and scanning electron microscopy. (author)

  4. Piezoelectric Response Evaluation of ZnO Thin Film Prepared by RF Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Cheng Da-Long

    2017-01-01

    Full Text Available The most important parameter of piezoelectric materials is piezoelectric coefficient (d33. In this study, the piezoelectric ZnO thin films were deposited on the SiNx/Si substrate. The 4 inches substrate is diced into 8 cm× 8 cm piece. During the deposition process, a zinc target (99.999 wt% of 2 inches diameter was used. The vertical distance between the target and the substrate holder was fixed at 5 cm. The piezoelectric response of zinc oxide (ZnO thin films were obtained by using a direct measurement system. The system adopts a mini impact tip to generate an impulsive force and read out the piezoelectric signals immediately. Experimentally, a servo motor is used to produce a fixed quantity of force, for giving an impact against to the piezoelectric film. The ZnO thin films were deposited using the reactive radio frequency (RF magnetron sputtering method. The electric charges should be generated because of the material’s extrusion. This phenomenon was investigated through the oscilloscope by one shot trigger. It was apparent that all ZnO films exhibit piezoelectric responses evaluated by our measurement system, however, its exhibit a significant discrepancy. The piezoelectric responses of ZnO thin film at various deposition positions were measured and the crystal structures of the sputtering pressure were also discussed. The crystalline characteristics of ZnO thin films are investigated through the XRD and SEM. The results show the ZnO thin film exhibits good crystalline pattern and surface morphology with controlled sputtering condition. The ZnO thin films sputtered using 2 inches target present various piezoelectric responses. With the exactly related position, a best piezoelectric response of ZnO thin film can be achieved.

  5. Development of a microwave-assisted digestion method using ICP-OES to measure metals in gum deposits of internal combustion engines

    Energy Technology Data Exchange (ETDEWEB)

    Dantas, Allan N.S.; Costa, Rouse S.; Gouveia, Sandro T.; Lopes, Gisele S. [Departamento de Quimica Analitica e Fisico-Quimica, Universidade Federal do Ceara, Fortaleza, CE (Brazil)

    2010-11-15

    The heterogeneous nature of gum samples obtained from the deposits of internal combustion engines is the main difficulty in accurate determination of their metal content. A microwave-assisted digestion method was implemented using factorial experimental design. The optimization of this procedure was carried out by first evaluating the effects of variables on the response (i.e., the residual carbon content or RCC). The variables of maximum heating power, heating time and nitric acid volume were studied. The RCC response was measured by inductively coupled plasma optical emission spectrometry (ICP-OES). The time of maximum heating power was essential to obtain a desired RCC. The surface response was constructed with optimal conditions presented at 6 min and heating power of 700 W. Amounts of aluminum (Al), calcium (Ca), copper (Cu), iron (Fe), magnesium (Mg), manganese (Mn), nickel (Ni), lead (Pb) and zinc (Zn) were determined in 26 gum samples by ICP-OES. Ca, Fe, Mg and Zn were found at mg g{sup -1} levels in the samples, while Al, Cu, Mn, Ni and Pb were found at mg kg{sup -1} levels. Principal component analysis (PCA) was used to establish a correlation between the gum samples and the different metal contents. Three distinct groups were separated according to the characteristics of the collected samples. (author)

  6. Determination of heavy metals by ICP-OES and F-AAS after preconcentration with 2,2'-bipyridyl and erythrosine.

    Science.gov (United States)

    Feist, Barbara; Mikula, Barbara; Pytlakowska, Katarzyna; Puzio, Bozena; Buhl, Franciszek

    2008-04-15

    The applicability of 2,2'-bipyridyl and erythrosine co-precipitation method for the separation and preconcentration of some heavy metals, such as Cd, Co, Cu, Ni, Pb and Zn in actual samples for their determination by ICP-OES and F-AAS was studied. Experimental conditions influencing the recovery of the investigated metals, such as pH, molar ratio of 2,2'-bipyridyl to erythrosine, the effect of time on co-precipitation were optimized. The analytical characteristics of the method (e.g. limit of detection, sensitivity, linear range and preconcentration factor) were obtained. The limits of detection LOD (ng mL(-1)) of the ICP-OES (F-AAS) method were: Cd: 4.0 (7.75), Co: 3.1 (57.2), Cu: 18 (10.3), Ni 21.3 (32.8), Pb: 35.9 (29.2) and Zn: 10.2 (6.90). The recovery of all the elements tested was more than 93%. The influence of inorganic matrix was examined. The proposed method was applied to determination of Cd, Co, Cu, Ni, Pb and Zn in vegetables and certified reference material (NCS ZC85006 Tomato).

  7. On-line solid phase extraction using ion-pair microparticles combined with ICP-OES for the simultaneous preconcentration and determination of uranium and thorium

    Energy Technology Data Exchange (ETDEWEB)

    Yousefi, Seyed Reza; Zolfonoun, Ehsan [Nuclear Science and Technology Research Institute, Tehran (Iran, Islamic Republic of). NFCRS

    2016-07-01

    In this work, after on-line and in-situ solid phase extraction technique was used for the extraction and preconcentration of uranium and thorium from aqueous samples prior to inductively coupled plasma optical emission spectrometry (ICP-OES) determination. In this method, sodium hexafluorophosphate (as an ion-pairing agent) was added to the sample solution containing the cationic surfactant (dodecyltrimethylammonium bromide) and the complexing agent (dibenzoylmethane). A cloudy solution was formed as a result of formation of an ion pair between surfactant and hexafluorophosphate. The solid microparticles were passed through a microcolumn filter and the adsorbed microparticles were subsequently eluted with acid, which was directly introduced into the ICP-OES nebulizer. The main variables affecting the pre-concentration and determination steps of uranium and thorium were studied and optimized. Under the optimum conditions, the enhancement factors of 97 and 95 and the detection limits of 0.52 and 0.21 μg L{sup -1} were obtained for uranium and thorium, respectively.

  8. Deposition of nanostructured fluorocarbon plasma polymer films by RF magnetron sputtering of polytetrafluoroethylene

    Energy Technology Data Exchange (ETDEWEB)

    Kylian, Ondrej, E-mail: ondrej.kylian@gmail.com; Drabik, Martin; Polonskyi, Oleksandr; Cechvala, Juraj; Artemenko, Anna; Gordeev, Ivan; Choukourov, Andrei; Matolinova, Iva; Slavinska, Danka; Biederman, Hynek, E-mail: bieder@kmf.troja.mff.cuni.cz

    2011-07-29

    The RF magnetron sputtering of polytetrafluoroethylene target is studied with the aim to find out conditions leading to the deposition of super-hydrophobic thin films. It is shown that such coatings can be prepared at elevated pressures and a longer distance between the sputtered target and the substrate. This is explained by an increase in the density of longer C{sub x}F{sub y} molecules that reach the substrate and a lower flux of ions and CF{sub 2} radicals on the surface of growing film under such deposition conditions, as observed by optical emission spectroscopy and mass spectrometry. Such changes in plasma composition result in a deposition of rough films having F/C ratio close to 2 as observed by scanning electron microscopy and X-ray photoelectron spectroscopy, respectively. These findings clearly distinguish our results from the previous investigations of polytetrafluoroethylene sputtering performed at shorter distances from the target, where either low F/C ratio or low roughness of the deposited films did not allow reaching super-hydrophobic character of the coatings.

  9. Potential sputtering of target ions by Ar q+, Pb q+ projectiles from a silicon surface

    International Nuclear Information System (INIS)

    Wang, T.S.; Zhao, Y.T.; Peng, H.B.; Wang, S.W.; Fang, Y.; Ding, D.J.; Xiao, G.Q.

    2007-01-01

    Highly charged ions have been expected to be a powerful tool for the surface modification in nano-scale. The potential sputtering of highly charged ions on semi-conductors has the potential to be applied in the micro electronics and nano-technology. In this work, the Ar q+ and Pb q+ ions produced by an electron cyclotron resonance ion source have been used as projectiles to study their potential sputtering on silicon surface. The relative sputtering ion yield is measured with a micro-channel plate, correlated to the incidence angle, charge state and velocity of ions. The experimental results show evidently charge dependence and velocity dependence. The yield induced by the ions changes steeply with the incidence angle, which is much larger than the impact of single charged ion with the same velocity. In the case of Pb 36+ impact, a significant enhancement of the yield has been observed, while the q > 20. At the same time, the yield increases proportionally with the ion velocity. However, in the case of Ar 16+ , the yield decreases versus the increase of the velocity

  10. Synthesis and characterization of CdTe nanostructures grown by RF magnetron sputtering method

    Science.gov (United States)

    Akbarnejad, Elaheh; Ghoranneviss, Mahmood; Hantehzadeh, Mohammad Reza

    2017-08-01

    In this paper, we synthesize Cadmium Telluride nanostructures by radio frequency (RF) magnetron sputtering system on soda lime glass at various thicknesses. The effect of CdTe nanostructures thickness on crystalline, optical and morphological properties has been studied by means of X-ray diffraction (XRD), UV-VIS-NIR spectrophotometry, field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM), respectively. The XRD parameters of CdTe nanostructures such as microstrain, dislocation density, and crystal size have been examined. From XRD analysis, it could be assumed that increasing deposition time caused the formation of the wurtzite hexagonal structure of the sputtered films. Optical properties of the grown nanostructures as a function of film thickness have been observed. All the films indicate more than 60% transmission over a wide range of wavelengths. The optical band gap values of the films have obtained in the range of 1.62-1.45 eV. The results indicate that an RF sputtering method succeeded in depositing of CdTe nanostructures with high purity and controllable physical properties, which is appropriate for photovoltaic and nuclear detector applications.

  11. Magnetic nanostructures formation via local anodic oxidation and magnetron sputtering through lithographic mask

    Directory of Open Access Journals (Sweden)

    Lenka Pravdova

    2016-10-01

    Full Text Available Changes of magnetic properties of thin metallic films caused by the magnetron sputtering technique and by oxidation lithography were studied. The magnetic nanostructure formation was done via a lithography by sputtering the material through a mask. The anodic oxidation lithography (LAO via scanning probe microscopy (SPM device Ntegra Aura was used to attempt to create the magnetic nanostructures. At the beginning, the work has been scoped to the preparation and testing multilayered magnetic nanostructures based on different combinations in material composition of layers. The magnetic properties of these samples were examined by Kerr phenomenon. We observed increasing of the magnetic hardness of the magnetic nanostructure when the copper layer in the composition of ferromagnetic and antiferromagnetic multilayers has been replaced by an aluminium layer. Adding the aluminium layer onto the copper layer resulted in a decrease of magnetic hardness. This work was followed by creating of horizontal nanostructures by LAO. Changes induced by the LAO observed in the magnetic properties of the samples correspond mainly to topographical changes of the surface. Changes in the magnetic properties induced by LAO or by a variability of sputtered layers could lead to the further production of magnetic printed circuit or photonic nanostructures.

  12. Effect of gold sputtering on the adhesion of porcelain to cast and machined titanium.

    Science.gov (United States)

    Khung, Rathanak; Suansuwan, Napa Sukjai

    2013-07-01

    The bond strength of porcelain to titanium is insufficient to provide a clinically acceptable alternative to existing alloys for metal ceramic restorations. The purpose of the study was to investigate the effect of gold coating on the adhesion of porcelain to titanium. Forty titanium plates (25 × 8 × 1 mm) were prepared by casting and machining procedures to make 2 groups of each type (n=10). All plates were subjected to airborne-particle abrasion with alumina powder. One of each of the cast and machined groups was gold sputtered. A layer of porcelain was built up onto the titanium plates of all groups with a conventional technique. A precrack was created at the center of the specimen. Specimens were then subjected to a 4-point bending test with a universal testing machine. The load recorded from the test was used to determine adhesion in terms of the strain energy release rate (G value). The data were analyzed with ANOVA and post hoc testing (α=.05). The interfacial area of the tested specimen was then examined with scanning electron microscopy. The G values of the gold-sputtered groups were significantly higher than those of the uncoated groups for both cast and machined groups (Ptitanium was significantly improved when titanium was sputter coated with gold in both the cast and machined groups. Copyright © 2013 The Editorial Council of the Journal of Prosthetic Dentistry. Published by Mosby, Inc. All rights reserved.

  13. Withdrawn. Duplicate: Effect of gold sputtering on the adhesion of porcelain to cast and machined titanium.

    Science.gov (United States)

    Khung, Rathanak; Suansuwan, Napa Sukjai

    2013-08-01

    The bond strength of porcelain to titanium is insufficient to provide a clinically acceptable alternative to existing alloys for metal ceramic restorations. The purpose of the study was to investigate the effect of gold coating on the adhesion of porcelain to titanium. Forty titanium plates (25 × 8 × 1 mm) were prepared by casting and machining procedures to make 2 groups of each type (n=10). All plates were subjected to airborne-particle abrasion with alumina powder. One of each of the cast and machined groups was gold sputtered. A layer of porcelain was built up onto the titanium plates of all groups with a conventional technique. A precrack was created at the center of the specimen. Specimens were then subjected to a 4-point bending test with a universal testing machine. The load recorded from the test was used to determine adhesion in terms of the strain energy release rate (G value). The data were analyzed with ANOVA and post hoc testing (α=.05). The interfacial area of the tested specimen was then examined with scanning electron microscopy. The G values of the gold-sputtered groups were significantly higher than those of the uncoated groups for both cast and machined groups (Ptitanium was significantly improved when titanium was sputter coated with gold in both the cast and machined groups. Copyright © 2013 The Editorial Council of the Journal of Prosthetic Dentistry. Published by Mosby, Inc. All rights reserved.

  14. Effects of variable sticking coefficients on the stability of reactive sputtering process

    International Nuclear Information System (INIS)

    Li Chuan; Hsieh Janghsing

    2004-01-01

    In reactive sputtering, the introduction of a reactive gas can lead to a hysteresis transition from metal to compounds in both the target and substrate. The hysteresis transition is characterized by a sudden change in partial pressure, sputtering rate, fraction of compound formation, etc. Therefore, stability is an important issue in the process control. In this paper, a mathematical model with variable sticking coefficients based on surface kinetics is used to study the stability of the process. The variable sticking coefficient represents different mechanisms for surface reactions from the Langmuir to precursor type. In order to facilitate the analysis, several nondimensional parameters are identified and used for formulation. Results show that an unsteady system converges to a steady state relatively fast at low inflow rates. With an eigenvalue analysis, the range of positive eigenvalues is consistent with the presence of a hysteresis loop. It is also found that when the chemical reaction on the substrate is moderate, a higher sputter yield of the compound leads to a more stable steady state at lower inflow rates. Regarding the sticking mechanism, for the type of precursors with the parameter k < 1, the compound is easier to form and saturate on the surface due to the higher default sticking coefficient and the lower operating conditions for the hysteresis transition

  15. Electrical, optical and etching properties of Zn-Sn-O thin films deposited by combinatorial sputtering

    International Nuclear Information System (INIS)

    Kim, J. S.; Park, J. K.; Baik, Y. J.; Kim, W. M.; Jeong, J.; Seong, T. Y.

    2012-01-01

    Zn-Sn-O (ZTO) films are known to be able to form an amorphous phase, which provides a smooth surface morphology as well as etched side wall, when deposited by using the conventional sputtering technique and, therefore, to have a potential to be applied as transparent thin film transistors. In this study, ZTO thin films were prepared by using combined sputtering of ZnO and SnO 2 targets, and the dependences of their electrical and optical properties on the composition and the deposition parameters were examined. The Sn content in the films was varied in the range of 35 ∼ 85 at .%. The deposition was carried out at room temperature, 150 and 300 .deg. C, and the oxygen content in sputtering gas was varied from 0 to 1 vol.%. Sn-rich films had better electrical properties, but showed large oxygen deficiency when deposited at low oxygen partial pressures. ZTO films with Sn contents lower than 55 at.% had good optical transmission, but the electrical properties were poor due to very low carrier concentrations. A high Hall mobility of larger than 10 cm 2 /Vs could be obtained in the carrier density range 10 17 ∼ 10 20 cm -3 , and the etching rate was measurable for films with Sn content up to 70 at.% when using a dilute HCl solution, indicating a good possibility of utilizing ZTO films for device applications.

  16. Stress evolution during and after sputter deposition of thin Cu Al alloy films

    Science.gov (United States)

    Pletea, M.; Wendrock, H.; Kaltofen, R.; Schmidt, O. G.; Koch, R.

    2008-06-01

    The stress evolution during and after sputter deposition of thin Cu-Al alloy films containing 1 and 2 at.% Al onto oxidized Si(100) substrates has been studied up to thicknesses of 300 nm by means of in situ substrate curvature measurements. In order to correlate stress and morphology, the microstructure was investigated by focused ion beam microscopy, scanning electron microscopy, and atomic force microscopy. The evolution of the stress and microstructure of the Cu-Al alloy films is similar to that for sputtered pure Cu films. Film growth proceeds in the Volmer-Weber mode, typical for high mobility metals. It is characterized by nucleation, island, percolation, and channel stages before the films become continuous, as well as lateral grain growth in the compact films. With increasing Al content the overall atom mobility and, thus, the average grain size of the alloy films are reduced. Increase of the sputter pressure from 0.5 to 2 Pa leads to films with larger grain size, rougher surface morphology and higher electrical resistivity.

  17. Volumetric erosion rate reduction of Hall thruster channel wall during ion sputtering process

    International Nuclear Information System (INIS)

    Yu Daren; Li Yuquan

    2007-01-01

    The mechanisms of the volumetric erosion rate reduction of the channel wall were studied theoretically and numerically in order to explain the reasons why the volumetric erosion rate of Hall thruster channel decreases over time. The results of the theoretical analysis indicate that the variation of three sputtering conditions results from the increase in the tilt angle and the erosion depth of the channel wall erosion surface during the surface evolution process. The mass loss of the Hall thruster channel wall material is a reduction process due to which the ion flux divergent angle is smaller than the value that corresponds to the sufficient condition of the reduction process. The simulation results of the channel wall erosion process qualitatively agree well with the experimental results, and the numerical analysis of the reduction process shows that the magnitude orders of three sputtering condition variation effects on the volumetric erosion rate reduction are the same, and the reduction rate reaches its maximum value in the initial operation period when the ion radiation angle equals the optimum sputtering rate angle. This work provides theoretical fundamentals of the channel wall erosion reduction process and it can be used for the lifetime prediction and optimum design of the Hall thruster

  18. Simple model of surface roughness for binary collision sputtering simulations

    Science.gov (United States)

    Lindsey, Sloan J.; Hobler, Gerhard; Maciążek, Dawid; Postawa, Zbigniew

    2017-02-01

    It has been shown that surface roughness can strongly influence the sputtering yield - especially at glancing incidence angles where the inclusion of surface roughness leads to an increase in sputtering yields. In this work, we propose a simple one-parameter model (the "density gradient model") which imitates surface roughness effects. In the model, the target's atomic density is assumed to vary linearly between the actual material density and zero. The layer width is the sole model parameter. The model has been implemented in the binary collision simulator IMSIL and has been evaluated against various geometric surface models for 5 keV Ga ions impinging an amorphous Si target. To aid the construction of a realistic rough surface topography, we have performed MD simulations of sequential 5 keV Ga impacts on an initially crystalline Si target. We show that our new model effectively reproduces the sputtering yield, with only minor variations in the energy and angular distributions of sputtered particles. The success of the density gradient model is attributed to a reduction of the reflection coefficient - leading to increased sputtering yields, similar in effect to surface roughness.

  19. TiCx thin films coatings prepared by reactive sputtering

    International Nuclear Information System (INIS)

    Saoula, N.; Handa, K.; Kesri, R.

    2004-01-01

    demonstrate clearly the great influence of the variation of different parameters (deposition time, RF power, total pressure, gas mixture (Ar+CH 4 ) on the film growth rates and thickness. The aim of present work is to study their influence of gas mixture, more specifically of carbon content on the structure, composition and the hardness of TiC coatings, prepared using an RF sputtering system

  20. Significance of negative ion formation in sputtering and SIMS analysis

    International Nuclear Information System (INIS)

    Cuomo, J.J.; Gambino, R.J.; Harper, J.M.E.; Kuptsis, J.D.; Webber, J.C.

    1978-01-01

    An unexpected substrate etching phenomenon during the sputtering of certain intermetallic compounds has been found to be caused by a large flux of negative metal ions from the sputtering target. The substrates directly under the target in a diode geometry are etched (eroded) rather than coated with a film. The occurrence of this substrate etching has been correlated with negative ion yields measured by secondary ion mass spectroscopy (SIMS). We find a high yield of negative metal ions from several intermetallic compounds in addition to the highly ionic compounds previously reported. A model based on electron charge transfer is presented which predicts when negative ion formation will be important, and the dependence of etch rate on target voltage is also treated. We predict that negative ion effects will be found in the sputtering of a wide range of compounds

  1. Magnetron sputtering cathode for low power density operation

    Directory of Open Access Journals (Sweden)

    T. Motomura

    2017-12-01

    Full Text Available A novel magnetron sputtering cathode with a magnetic mirror configuration is proposed, for low power density operation. The magnetic field profiles are simply constructed using two cylindrical permanent magnets positioned behind the disk-shaped sputtering target of 50 mm in diameter. The magnetic mirror configuration near the center and the outer edges of the target enables low power density operation up to 0.25 W/cm2 in the case of DC input power of 5 W. A sputtering rate of ∼0.2 nm/min was obtained under experimental conditions with target-substrate distance of 280 mm, Ar gas pressure of 0.1 Pa, and DC input power of 15 W.

  2. Angular distributions of sputtered particles from NiTi alloy

    International Nuclear Information System (INIS)

    Neshev, I.; Hamishkeev, V.; Chernysh, V.S.; Postnikov, S.; Mamaev, B.

    1993-01-01

    The angular distributions of sputtered Ni and Ti from a polycrystalline NiTi (50-50%) alloy are investigated by Auger electron spectroscopy and Rutherford backscattering spectroscopy. A difference in the angular distributions is observed with Ni being sputtered preferentially near the surface normal. A computer program for the calculation of the angular distributions of constituents sputtered from binary targets is created and used. The mechanisms responsible for the observed differences in the angular distributions are discussed. It is found that the collisional cascade theory is not directly applicable to the results of the constituents' angular distributions obtained in the presence of oxygen. The fitted coefficients of bombardment-induced segregation are found to be greater than the experimentally obtained ones. (author)

  3. Recent advancements in sputter-type heavy negative ion sources

    International Nuclear Information System (INIS)

    Alton, G.D.

    1989-01-01

    Significant advancement have been made in sputter-type negative ion sources which utilize direct surface ionization, or a plasma to form the positive ion beam used to effect sputtering of samples containing the material of interest. Typically, such sources can be used to generate usable beam intensities of a few μA to several mA from all chemically active elements, depending on the particular source and the electron affinity of the element in question. The presentation will include an introduction to the fundamental processes underlying negative ion formation by sputtering from a low work function surface and several sources will be described which reflect the progress made in this technology. 21 refs., 9 figs., 1 tab

  4. Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions

    Science.gov (United States)

    Vašina, P; Hytková, T; Eliáš, M

    2009-05-01

    The majority of current models of the reactive magnetron sputtering assume a uniform shape of the discharge current density and the same temperature near the target and the substrate. However, in the real experimental set-up, the presence of the magnetic field causes high density plasma to form in front of the cathode in the shape of a toroid. Consequently, the discharge current density is laterally non-uniform. In addition to this, the heating of the background gas by sputtered particles, which is usually referred to as the gas rarefaction, plays an important role. This paper presents an extended model of the reactive magnetron sputtering that assumes the non-uniform discharge current density and which accommodates the gas rarefaction effect. It is devoted mainly to the study of the behaviour of the reactive sputtering rather that to the prediction of the coating properties. Outputs of this model are compared with those that assume uniform discharge current density and uniform temperature profile in the deposition chamber. Particular attention is paid to the modelling of the radial variation of the target composition near transitions from the metallic to the compound mode and vice versa. A study of the target utilization in the metallic and compound mode is performed for two different discharge current density profiles corresponding to typical two pole and multipole magnetics available on the market now. Different shapes of the discharge current density were tested. Finally, hysteresis curves are plotted for various temperature conditions in the reactor.

  5. Application of ICP-OES for Evaluating Energy Extraction and Production Wastewater Discharge Impacts on Surface Waters in Western Pennsylvania

    Science.gov (United States)

    Oil and gas extraction and coal-fired electrical power generating stations produce wastewaters that are treated and discharged to rivers in Western Pennsylvania with public drinking water system (PDWS) intakes. Inductively coupled plasma optical emission spectroscopy (ICP-OES) w...

  6. Measurement of chemical sputtering yields of various types of carbon

    International Nuclear Information System (INIS)

    Yamada, R.; Nakamura, K.; Sone, K.; Saidoh, M.

    1980-01-01

    The methane formation from carbon due to the bombardment with hydrogen ions has been studied. The influences of the dose of incident ions and the types of carbon on methane production rate under the careful pretreatment of carbon are described in this paper. The incident energy of the hydrogen ions used was in the range from 0.1 to 6 keV for the purpose of filling the lack of the chemical sputtering coefficient for low energy hydrogen ions. The samples used were two kinds of pyrolytic graphite. Both basal and edge planes which were cut perpendicularly and in parallel to c-axis, respectively, were used as the surfaces of targets for the bombardment with H + ions. Other kinds of carbon used were isotropic atomic grade graphite and glassy carbon. A quadrupole mass spectrometer was used for the measurement of the methane formation. The methane production rate increased with dose, and gradually reached a constant value. The samples which were pre-bombarded with hydrogen ions showed the very different dose dependence of methane production rate. The anomalous rate can be explained by the particle-induced desorption of super-saturated hydrogen concentration in the target. The energy and temperature dependences of the methane production rate were almost same for the various carbon materials. (Kato, T.)

  7. Sputtered boron indium oxide thin-film transistors

    Science.gov (United States)

    Stewart, Kevin A.; Gouliouk, Vasily; Keszler, Douglas A.; Wager, John F.

    2017-11-01

    Boron indium oxide (BIO) is studied for thin-film transistor (TFT) channel layer applications. Sputtered BIO thin films exhibit an amorphous phase over a wide range of B2O3/In2O3 ratios and remain amorphous up to 500 °C. The band gap decreases linearly with decreasing boron content, whereas device performance generally improves with decreasing boron content. The best amorphous BIO TFT exhibits a field-effect mobility of 10 cm2 V-1 s-1, turn-on voltage of 2.5 V, and sub-threshold swing of 0.72 V/dec. Decreasing the boron content to 12.5% leads to a polycrystalline phase, but further increases the mobility up to 20-40 cm2 V-1 s-1. TCAD simulation results suggest that the reason for higher performance after increasing the anneal temperature from 200 to 400 °C is due to a lower defect density in the sub-bandgap region of the BIO channel layer.

  8. Multilayer Optical Coating Fabrication By Ion Beam Sputter Deposition

    Science.gov (United States)

    Becker, Juergen; Scheuer, Volker

    1989-02-01

    Ion Beam Sputter Deposition (IBSD) was proven to be a useful technique for producing high performance optical coatings. However, compared to other deposition techniques, several problems remain to be solved, such as low deposition rates, small areas with homogeneous deposition rate and the problem of contamination. In the work described here, a cubic vacuum chamber has been equipped with a commercially available ion beam source, a triple stage target holder and a rotating substrate holder. The primary interest was to get a reasonable deposition rate over a sufficiently large area. Single layers of SiO2, Ta205 and TiO2 and multilayers of Si02/Ta205 were produced. Contaminants in the films were analyzed by various techniques mainly by Total-Reflection X-ray Fluorescence (TXRF). Optical properties of the coatings were investigated to study the influence of the contaminants on the performance of the optical coatings. The optical properties were characterized by the refractive index, the absorption coefficient and the scattering behaviour. Scattering losses were measured by means of Total Integrated Scattering (TIS) and Angle Resolved Scattering (ARS). The damage threshold against high-power laser pulses of 1.06 pm was determined.

  9. Deposition temperature influence on sputtered nanogranular magnetoresistive composites

    Energy Technology Data Exchange (ETDEWEB)

    Mujika, M. [CEIT and Tecnun (University of Navarra), Manuel de Lardizabal 15, 20018 San Sebastian (Spain)]. E-mail: mmujika@ceit.es; Arana, S. [CEIT and Tecnun (University of Navarra), Manuel de Lardizabal 15, 20018 San Sebastian (Spain); Castano, E. [CEIT and Tecnun (University of Navarra), Manuel de Lardizabal 15, 20018 San Sebastian (Spain)

    2007-09-15

    Among different physical principles magnetic sensors for low magnetic field detection can be based on, granular giant magnetoresistances have been studied due to their high sensitivity to small field changes and gradual magnetoresistance change at low fields. Following this aim, nanogranular Ag-Co thin films, deposited by DC co-sputtering from Ag and Co targets at different deposition temperatures have been tested. Samples have been grown at room temperature, 100 and 200 deg. C and annealed in a mixture of N{sub 2} and H{sub 2} at 200 and 300 deg. C for 45 min. The samples that have shown the best performance have been subjected to two sets of measurements where an external field has been applied in-plane and perpendicular to the film plane. The best performance has been shown by the samples deposited at room temperature and annealed at 300 deg. C, reporting a maximum value of magnetoresistance of 16.7% at 1.4 T and a linear sensitivity of 63%/T between 0.04 and 0.07 T within a magnetoresistance range varying from 1.5% to 3% when subjected to an in-plane external field.

  10. Deposition temperature influence on sputtered nanogranular magnetoresistive composites

    International Nuclear Information System (INIS)

    Mujika, M.; Arana, S.; Castano, E.

    2007-01-01

    Among different physical principles magnetic sensors for low magnetic field detection can be based on, granular giant magnetoresistances have been studied due to their high sensitivity to small field changes and gradual magnetoresistance change at low fields. Following this aim, nanogranular Ag-Co thin films, deposited by DC co-sputtering from Ag and Co targets at different deposition temperatures have been tested. Samples have been grown at room temperature, 100 and 200 deg. C and annealed in a mixture of N 2 and H 2 at 200 and 300 deg. C for 45 min. The samples that have shown the best performance have been subjected to two sets of measurements where an external field has been applied in-plane and perpendicular to the film plane. The best performance has been shown by the samples deposited at room temperature and annealed at 300 deg. C, reporting a maximum value of magnetoresistance of 16.7% at 1.4 T and a linear sensitivity of 63%/T between 0.04 and 0.07 T within a magnetoresistance range varying from 1.5% to 3% when subjected to an in-plane external field

  11. Algan/Gan Hemt By Magnetron Sputtering System

    Science.gov (United States)

    Garcia Perez, Roman

    In this thesis, the growth of the semiconductor materials AlGaN and GaN is achieved by magnetron sputtering for the fabrication of High Electron Mobility Transistors (HEMTs). The study of the deposited nitrides is conducted by spectroscopy, diffraction, and submicron scale microscope methods. The preparation of the materials is performed using different parameters in terms of power, pressure, temperature, gas, and time. Silicon (Si) and Sapphire (Al2O3) wafers are used as substrates. The chemical composition and surface topography of the samples are analyzed to calculate the materials atomic percentages and to observe the devices surface. The instruments used for the semiconductors characterization are X-ray Photoelectron Spectroscopy (XPS), X-ray Diffraction (XRD), Scanning Electron Microscopy (SEM), and Atomic Force Microscope (AFM). The project focused its attention on the reduction of impurities during the deposition, the controlled thicknesses of the thin-films, the atomic configuration of the alloy AlxGa1-xN, and the uniformity of the surfaces.

  12. Characterization and tribocorrosion behavior of sputtered NiTi coatings

    Energy Technology Data Exchange (ETDEWEB)

    Jin, XiaoMin; Gao, Lizhen [Taiyuan University of Technology (China). College of Environmental Science and Engineering; Wang, Hefeng [Taiyuan University of Technology (China). College of Mechanics; Liu, Erqiang [Taiyuan University of Technology (China). Inst. of Applied Mechanics and Biomedical Engineering

    2016-02-15

    In this study, NiTi coatings were deposited onto AISI 316L stainless steel substrates by closed field unbalanced magnetron sputtering. The microstructure and properties of the coatings were characterized by means of X-ray diffraction, scanning electron microscopy, and nano-indentation. The tribocorrosion resistance and corrosion behavior of the stainless steel substrates and NiTi coatings were investigated in Hanks' solution. The experimental results indicated the NiTi coatings show higher corrosion polarization resistance and a more stable corrosion potential in the Hanks' solution than the uncoated stainless steel substrate. The NiTi coatings also exhibited excellent wear resistance and chemical stability in sliding tests with an Si{sub 3}N{sub 4} ball in the Hanks' solution. The tested samples showed different wear mechanisms in the sliding tests. Compared to the SS substrates, the NiTi coatings were more compatible with the Si{sub 3}N{sub 4} ball.

  13. The angular distributions of sputtered indium atoms at different temperature

    International Nuclear Information System (INIS)

    Zhang Jiping; Wang Zhenxia; Tao Zhenlan; Pan Jisheng

    1993-01-01

    The effect of temperature and surface topography on the angular distribution of indium atoms was studied under bombardment by 2T KeV Ar + ions at normal incidence. Experiments were carried out on two samples, A and B, at 25 o C and 70 o C respectively. The function Y(θ) = a cosθ + b cos n θ, where θ is the sputtering angle, was found to fit the experimental data. The term (a cos θ) corresponds to the cosine distribution predicted by random collision cascade theory, and the term (b cos n θ) is dependent on factors such as the surface topography. For sample A, a∼b, whereas for sample B a< b. The surface of A consisted of flat and pebble like regions of almost equal area while the surface of B was more cratered. An explanation of the fitting values of a,b and n is given in terms of the shielding effects of the different structures. (UK)

  14. Advances in sputtered and ion plated solid film lubrication

    Science.gov (United States)

    Spalvins, T.

    1985-01-01

    The glow discharge or ion assisted vacuum deposition techniques, primarily sputtering and ion plating, have rapidly emerged and offer great potential to deposit solid lubricants. The increased energizing of these deposition processes lead to improved adherence and coherence, favorable morphological growth, higher density, and reduced residual stresses in the film. These techniques are of invaluable importance where high precision machines tribo-components require very thin, uniform lubricating films (0.2 m), which do not interface with component tolerances. The performance of sputtered MoS2 films and ion plated Au and Pb films are described in terms of film thickness, coefficient of friction, and wear lives.

  15. Plasma diagnostics during magnetron sputtering of aluminum doped zinc oxide

    DEFF Research Database (Denmark)

    Stamate, Eugen; Crovetto, Andrea; Sanna, Simone

    2016-01-01

    Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity of the f......Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity...

  16. Optical properties of d.c. magneto sputtered tantalum and titanium ...

    Indian Academy of Sciences (India)

    Administrator

    Department of Physics, University of Rajasthan, Jaipur 302 004, India. MS received 19 April 2009; revised 20 May 2009. Abstract. ... Magnetron sputtering has become the process of choice for the deposition of wide range of important ... Sputtering unit with multiple targets. (a) View of sputtering unit with Argon cylinder and.

  17. Characterization of X-Ray Mirror Multilayers Sputtered in Reactive Atmospheres.

    Science.gov (United States)

    Diehl, Patrick Edward

    Multilayer structures of two or more materials have important applications in X-ray telescopes, microscopes, and lithography equipment. Adequate reflectivity values for particular X-ray wavelengths, can be obtained by selecting materials with appropriate optical constants and then depositing structures with geometries that should optimize the reflectivity and bandwidth for the specific application. Many parameters in the deposition process and the multilayer itself can adversely affect the final reflectivity. The objective of this work has been to investigate the potential benefits of adding reactive gasses to the inert atmosphere of the deposition system. All films were produced by d.c. magnetron sputtering in argon atmospheres with reactive gas addition. The microstructure and chemistry of the sputtered films were characterized using Transmission/High-Resolution Electron Microscopy, X-ray Diffraction, X-ray Photoelectron Spectroscopy, Fourier Transform Infrared Spectroscopy, Secondary Ion Mass Spectroscopy, Electron Probe Microanalysis, and Ion Beam Analysis with MeV helium beams. Two series of WC_{rm x}/B_4C thin-film multilayers were deposited with methane additions (up to 18%). Thin films of boron carbide and tungsten were also deposited to provide information about individual layers. High-resolution electron microscopy micrographs showed that the individual layers were completely amorphous, although diffraction studies (electron and X-ray) indicated well-defined layer ordering. Chemical analysis revealed that the multilayers contained significant levels of hydrogen, in addition to carbon. The amounts of hydrogen and carbon increased with the methane percentage, and oxygen (present in all samples) and hydrogen were preferentially incorporated into the boron carbide. The peak reflectivity for Mg K- alpha radiation depended on the methane concentration: the sample sputtered in 12% methane showed the highest reflectivity of 30%. Annealing of a representative

  18. Fabrication of bioactive, antibacterial TiO2 nanotube surfaces, coated with magnetron sputtered Ag nanostructures for dental applications.

    Science.gov (United States)

    Uhm, Soo-Hyuk; Lee, Sang-Bae; Song, Doo-Hoon; Kwon, Jae-Sung; Han, Jeon-Geon; Kim, Kyoung-Nam

    2014-10-01

    We investigated whether a silver coating on an anodic oxidized titania (TiO2) nanotube surface would be useful for preventing infections in dental implants. We used a magnetron sputtering process to deposit Ag nanoparticles onto a TiO2 surface. We studied different sputtering input power densities and maintained other parameters constant. We used scanning electron microscopy, X-ray diffraction, and contact angle measurements to characterize the coated surfaces. Staphylococcus aureus was used to evaluate antibacterial activity. The X-ray diffraction analysis showed peaks that corresponded to metallic Ag, Ti, O, and biocompatible anatase phase TiO2 on the examined surfaces. The contact angles of the Ag nanoparticle-loaded surfaces were significantly lower at 2.5 W/cm2 input power under pulsed direct current mode compared to commercial, untreated Ti surfaces. In vitro antibacterial analysis indicated that a significantly reduced number of S. aureus were detected on an Ag nanoparticle-loaded TiO2 nanotube surface compared to control untreated surfaces. No cytotoxicity was noted, except in the group treated with 5 W/cm2 input power density, which was the highest input of power density we tested for the magnetron sputtering process. Overall, we concluded that it was feasible to create antibacterial Ag nanoparticle-loaded titanium nanotube surfaces with magnetron sputtering.

  19. High-performance anode for Polymer Electrolyte Membrane Fuel Cells by multiple-layer Pt sputter deposition

    Science.gov (United States)

    Natarajan, Sadesh Kumar; Hamelin, Jean

    We investigate the sputtering deposition as a tool for preparing Polymer Electrolyte Membrane Fuel Cell (PEMFC) electrodes with improved performance and catalyst utilization. Anodes of PEMFC with ultra-low loading of Pt (0.05 mg cm -2) are developed by alternate sputtering of Pt and painting layers of carbon nanotube ink with Nafion directly on the gas diffusion layer. Sputter depositing alternate layers of Pt on carbon-Nafion layer (CNL) has increased the anode activity over single-layer Pt deposited anode due to improved porosity and the presence of Pt nanoparticles in the inner CNL. Also, we investigated the influence of Nafion content in the CNL. The optimal Nafion content giving less resistance and better performance in an anode is 29 wt.%. This is significantly lower than for standard MEA anodes, indicating sufficient interfacial contact between each CNL. We studied the anodes prepared with 50 wt.% Nafion, which revealed larger ohmic resistance and also, blocks the CNL pores reducing gas permeability. Excellent mass transfer and performance is obtained with three-layer Pt sputter deposited anode with CNL containing 29 wt.% of Nafion.

  20. Structural and optical properties of gold-incorporated diamond-like carbon thin films deposited by RF magnetron sputtering

    Science.gov (United States)

    Majeed, Shahbaz; Siraj, K.; Naseem, S.; Khan, Muhammad F.; Irshad, M.; Faiz, H.; Mahmood, A.

    2017-07-01

    Pure and gold-doped diamond-like carbon (Au-DLC) thin films are deposited at room temperature by using RF magnetron sputtering in an argon gas-filled chamber with a constant flow rate of 100 sccm and sputtering time of 30 min for all DLC thin films. Single-crystal silicon (1 0 0) substrates are used for the deposition of pristine and Au-DLC thin films. Graphite (99.99%) and gold (99.99%) are used as co-sputtering targets in the sputtering chamber. The optical properties and structure of Au-DLC thin films are studied with the variation of gold concentration from 1%-5%. Raman spectroscopy, atomic force microscopy (AFM), Vickers hardness measurement (VHM), and spectroscopic ellipsometry are used to analyze these thin films. Raman spectroscopy indicates increased graphitic behavior and reduction in the internal stresses of Au-DLC thin films as the function of increasing gold doping. AFM is used for surface topography, which shows that spherical-like particles are formed on the surface, which agglomerate and form larger clusters on the surface by increasing the gold content. Spectroscopy ellipsometry analysis elucidates that the refractive index and extinction coefficient are inversely related and the optical bandgap energy is decreased with increasing gold content. VHM shows that gold doping reduces the hardness of thin films, which is attributed to the increase in sp2-hybridization.

  1. Enhanced pool boiling critical heat flux induced by capillary wicking effect of a Cr-sputtered superhydrophilic surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Son, Hong Hyun; Seo, Gwang Hyeok; Kim, Sung Joong [Hanyang University, Seoul (Korea, Republic of)

    2016-10-15

    In light of boiling heat transfer, the smooth surface potentially reduces active nucleation of bubbles and rewetting of dry spots near the critical heat flux (CHF). This kind of process is highly likely to deteriorate the CHF. Thus, it is essential to produce appropriate microstructures on the surface for the enhancement of the CHF. In this study, to investigate the microstructural effect of thin film-fabricated surfaces on the pool boiling CHF, we controlled the surface roughness in a narrow range of 0.1-0.25 μm and its morphologies, in the form of micro-scratches using PVD sputtering technique. Specifically for DC magnetron sputtering, pure chromium (Cr) was selected as a target material owing to its high oxidation resistance. In order to analyze the CHF trend with changes in roughness, we introduced existing capillary wicking-based models because superhydrophilic characteristics of microstructures are highly related to the capillary wicking behaviors in micro-flow channels. After Cr sputtering under given conditions, the Cr-sputtered surfaces showed superhydrophilic characteristics and its capability became more enhanced with an increase of surface roughness. Judging from spreading behavior of a liquid droplet, the presence of micro-wicking channels, coupled with Cr nanostructures, effectively enhanced the advancing rate of drop base diameter. The CHF exhibited an increasing trend with increasing surface roughness. However, the enhancement ratio agreed poorly with the predictions of the roughness factor-based models, all of which originated from a conventional static force balance.

  2. The optical properties and applications of AlN thin films prepared by a helicon sputtering system

    CERN Document Server

    Chiu, W Y; Kao, H L; Jeng, E S; Chen, J S; Jaing, C C

    2002-01-01

    AlN thin films were grown on SiO sub 2 /Si and quartz substrates using a helicon sputtering system. The dependence of film quality on growth parameters, such as total sputtering pressure, substrate temperature, and nitrogen concentration has been studied. There is a good correlation of thin film crystallinity addressed by x-ray diffraction (XRD) and spectroscopic ellipsometer. The optimized films exhibit highly oriented, with only (002) peak shown in a theta-2 theta scan XRD pattern, and extremely smooth surface with rms roughness of 2 Aa. The extinction coefficient of the film was 4x10 sup - sup 4 , which is lower than that of AlN films grown by conventional sputtering. Double-layer antireflection (DLAR) coating using AlN and Al sub 3 O sub 3 grown on quartz has been demonstrated. The transmittance of DLAR was high as 96% compared to 93% of bare substrates with the measurement error less than 0.2%. AlN films prepared by Helicon sputtering thus are potential for optical application.

  3. Application of magnetron sputtering for producing bioactive ceramic ...

    Indian Academy of Sciences (India)

    Wintec

    bone tissue engineering. 45S5-coated implants exhibited greater bone ingrowth compared with HA-coated implants, and they maintained their mechanical integrity over time. (Wheeler et al 2001). And the biological performance of the BG/HA sputter coating is more excellent (Wolke et al. 2005). Zirconia (ZrO2), especially ...

  4. RF sputtering: A viable tool for MEMS fabrication

    Indian Academy of Sciences (India)

    In the present work, we report preparation of silicon dioxide, silicon nitride and piezoelec- tric ZnO films by RF sputtering process. The properties of these films relevant for MEMS applications have been evaluated. The application of these films in fabricating basic MEMS structures such as diaphragm, micro-cantilever beams ...

  5. Physicochemical model for reactive sputtering of hot target

    Energy Technology Data Exchange (ETDEWEB)

    Shapovalov, Viktor I., E-mail: vishapovalov@mail.ru; Karzin, Vitaliy V.; Bondarenko, Anastasia S.

    2017-02-05

    A physicochemical model for reactive magnetron sputtering of a metal target is described in this paper. The target temperature in the model is defined as a function of the ion current density. Synthesis of the coating occurs due to the surface chemical reaction. The law of mass action, the Langmuir isotherm and the Arrhenius equation for non-isothermal conditions were used for mathematical description of the reaction. The model takes into consideration thermal electron emission and evaporation of the target surface. The system of eight algebraic equations, describing the model, was solved for the tantalum target sputtered in the oxygen environment. It was established that the hysteresis effect disappears with the increase of the ion current density. - Highlights: • When model is applied for a cold target, hysteresis width is proportional to the ion current density. • Two types of processes of hot target sputtering are possible, depending on the current density: with and without the hysteresis. • Sputtering process is dominant at current densities less than 50 A/m{sup 2} and evaporation can be neglected. • For current densities over 50 A/m{sup 2} the hysteresis width reaches its maximum and the role of evaporation increases.

  6. Doubly Charged Ion Emission in Sputtering of Monocrystalline Fluorides

    Czech Academy of Sciences Publication Activity Database

    Lörinčík, Jan; Šroubek, Zdeněk

    2002-01-01

    Roč. 187, - (2002), s. 447-450 ISSN 0168-583X R&D Projects: GA ČR GA202/99/0881; GA AV ČR IAA1067801 Institutional research plan: CEZ:AV0Z4040901 Keywords : secondary ion emission * doubly charged * sputtering Subject RIV: CF - Physical ; Theoretical Chemistry Impact factor: 1.158, year: 2002

  7. Development of ion beam sputtering techniques for actinide target preparation

    Science.gov (United States)

    Aaron, W. S.; Zevenbergen, L. A.; Adair, H. L.

    1985-06-01

    Ion beam sputtering is a routine method for the preparation of thin films used as targets because it allows the use of a minimum quantity of starting material, and losses are much lower than most other vacuum deposition techniques. Work is underway in the Isotope Research Materials Laboratory (IRML) at ORNL to develop the techniques that will make the preparation of actinide targets up to 100 μg/cm 2 by ion beam sputtering a routinely available service from IRML. The preparation of the actinide material in a form suitable for sputtering is a key to this technique, as is designing a sputtering system that allows the flexibility required for custom-ordered target production. At present, development work is being conducted on low-activity actinides in a bench-top system. The system will then be installed in a hood or glove box approved for radioactive materials handling where processing of radium, actinium, and plutonium isotopes among others will be performed.

  8. On the microstructure and interfacial properties of sputtered nickel ...

    Indian Academy of Sciences (India)

    Administrator

    (Walker et al 1990; Johnson 1991; Fu et al 2004). For a. Ti–Ni thin film to work as micro-device, control over working temperature and compositional tuning during deposition are the prime requisites. Due to inflexibility in composition adjustment, the fabrication of the Ti–Ni thin film by sputter deposition with Ti–Ni alloy target ...

  9. Application of magnetron sputtering for producing bioactive ceramic ...

    Indian Academy of Sciences (India)

    Wintec

    Mechanical Engineering Department, Jinan Vocational College, Shandong Jinan 250103, P.R. China. MS received 9 March 2008; revised 10 September 2008. Abstract. Radio frequency (RF) magnetron sputtering is a versatile deposition technique that can produce thin, uniform, dense calcium phosphate coatings.

  10. RF Reactive Magnetron Sputter Deposition of Silicon Sub-Oxides

    NARCIS (Netherlands)

    Hattum, E.D. van

    2007-01-01

    RF reactive magnetron plasma sputter deposition of silicon sub oxide E.D. van Hattum Department of Physics and Astronomy, Faculty of Sciences, Utrecht University The work described in the thesis has been inspired and stimulated by the use of SiOx layers in the direct inductive printing technology,

  11. On the microstructure and interfacial properties of sputtered nickel ...

    Indian Academy of Sciences (India)

    Administrator

    migration of adatoms. When films are sputter deposited on substrate held at higher temperature, surface migration of the adatoms with higher energy takes place. This is due to the fact that the adatoms gain additional energy apart from the kinetic energy while they reach the grow- ing film surface. This would result in the ...

  12. Particle dynamics during electronic sputtering of solid krypton

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1995-01-01

    We have modeled electronic sputtering of solid krypton by excimer production with molecular dynamics. Both excimer evolution in the solid and deexcitation processes have been incorporated in the simulation. The excimer dynamics in the lattice has been analyzed: the excimers formed near the surface...

  13. Modular design of AFM probe with sputtered silicon tip

    DEFF Research Database (Denmark)

    Rasmussen, Peter; Thaysen, Jacob; Bouwstra, Siebe

    2001-01-01

    of the thin films constituting the cantilever. The AFM probe has an integrated tip made of a thick sputtered silicon layer, which is deposited after the probe has been defined and just before the cantilevers are released. The tips are so-called rocket tips made by reactive ion etching. We present probes...

  14. Low-damage high-throughput grazing-angle sputter deposition on graphene

    International Nuclear Information System (INIS)

    Chen, C.-T.; Gajek, M.; Raoux, S.; Casu, E. A.

    2013-01-01

    Despite the prevalence of sputter deposition in the microelectronics industry, it has seen very limited applications for graphene electronics. In this letter, we report systematic investigation of the sputtering induced damages in graphene and identify the energetic sputtering gas neutrals as the primary cause of graphene disorder. We further demonstrate a grazing-incidence sputtering configuration that strongly suppresses fast neutral bombardment and retains graphene structure integrity, creating considerably lower damage than electron-beam evaporation. Such sputtering technique yields fully covered, smooth thin dielectric films, highlighting its potential for contact metals, gate oxides, and tunnel barriers fabrication in graphene device applications

  15. Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films

    Science.gov (United States)

    Pedrosa, Paulo; Ferreira, Armando; Cote, Jean-Marc; Martin, Nicolas; Yazdi, Mohammad Arab Pour; Billard, Alain; Lanceros-Mendez, Senentxu; Vaz, Filipe

    2017-10-01

    Titanium films were DC sputtered with a particle flux incidence angle of 80°, using the Glancing Angle Deposition (GLAD) technique with increasing sputtering pressures from 0.2 to 1.5 Pa. This range of pressures is typically implemented for the deposition of thin films by the magnetron sputtering process. The main objective of this work was to study the anisotropic electrical resistivity behaviour of the different thin film nanostructures that were obtained. It is shown that low sputtering pressures (0.2-0.5 Pa) promote higher column angles β with respect to the substrate normal (15° ≤ β ≤ 40°), as well as better defined porous structures. On the other hand, intermediate and high pressures (0.6-0.8 Pa) originate secondary growth effects on the columnar structures perpendicular to the substrate normal (β = 0°). No defined columns can be seen when the films are sputtered using the highest pressure (1.5 Pa). The electrical resistivity is significantly affected by the differences in the columnar microstructure. Porous films exhibit higher room temperature (RT) resistivity values (0.95-1.5 × 10-5 Ω m), when compared to the more compact ones (0.6-0.9 × 10-5 Ω m). When a temperature cycle of RT(25)-300-RT(25) °C was applied, a more significant oxidation is evidenced in the more porous structures, as well as a higher resistivity anisotropy (maximum of 1.6) than in the more compact ones (minimum of 1.25).

  16. Determination of discharge parameters via OES at the Linac4 H{sup −} ion source

    Energy Technology Data Exchange (ETDEWEB)

    Briefi, S., E-mail: stefan.briefi@physik.uni-augsburg.de [AG Experimentelle Plasmaphysik, Institut für Physik, Universität Augsburg, 86135 Augsburg (Germany); Fink, D.; Mattei, S.; Lettry, J. [Linac4 Ion Source Team, CERN-ABP, 1211 Geneva 23 (Switzerland); Fantz, U. [AG Experimentelle Plasmaphysik, Institut für Physik, Universität Augsburg, 86135 Augsburg (Germany); Max-Planck-Institut für Plasmaphysik, Boltzmannstraße 2, 85748 Garching (Germany)

    2016-02-15

    Optical emission spectroscopy (OES) measurements of the atomic Balmer series and the molecular Fulcher transition have been carried out at the Linac4 ion source in order to determine plasma parameters. As the spectroscopic system was only relatively calibrated, the data evaluation only yielded rough estimates of the plasma parameters (T{sub e} ≈ 1.2 eV, n{sub e} ≈ 1 × 10{sup 19} m{sup −3}, and n{sub H}/n{sub H{sub 2}} ≈ 0.5 at standard operational parameters). The analysis of the Fulcher transition revealed a non-thermal “hockey-stick” rotational population of the hydrogen molecules. At varying RF power, the measurements at the on-axis line of sight (LOS) showed a peak in the rotational temperatures between 25 and 40 kW of RF power, whereas a steady decrease with power was observed at a tilted LOS, indicating the presence of strong plasma parameter gradients.

  17. Simplified multi-element analysis of ground and instant coffees by ICP-OES and FAAS.

    Science.gov (United States)

    Szymczycha-Madeja, Anna; Welna, Maja; Pohl, Pawel

    2015-01-01

    A simplified alternative to the wet digestion sample preparation procedure for roasted ground and instant coffees has been developed and validated for the determination of different elements by inductively coupled plasma optical emission spectrometry (ICP-OES) (Al, Ba, Cd, Co, Cr, Cu, Mn, Ni, Pb, Sr, Zn) and flame atomic absorption spectrometry (FAAS) (Ca, Fe, K, Mg, Na). The proposed procedure, i.e. the ultrasound-assisted solubilisation in aqua regia, is quite fast and simple, requires minimal use of reagents, and demonstrated good analytical performance, i.e. accuracy from -4.7% to 1.9%, precision within 0.5-8.6% and recovery in the range 93.5-103%. Detection limits of elements were from 0.086 ng ml(-1) (Sr) to 40 ng ml(-1) (Fe). A preliminary classification of 18 samples of ground and instant coffees was successfully made based on concentrations of selected elements and using principal component analysis and hierarchic cluster analysis.

  18. Determination of 18 kinds of trace impurities in the vanadium battery grade vanadyl sulfate by ICP-OES

    Science.gov (United States)

    Yong, Cheng

    2018-03-01

    The method that direct determination of 18 kinds of trace impurities in the vanadium battery grade vanadyl sulfate by inductively coupled plasma atomic emission spectrometry (ICP-OES) was established, and the detection range includes 0.001% ∼ 0.100% of Fe, Cr, Ni, Cu, Mn, Mo, Pb, As, Co, P, Ti, Zn and 0.005% ∼ 0.100% of K, Na, Ca, Mg, Si, Al. That the influence of the matrix effects, spectral interferences and background continuum superposition in the high concentrations of vanadium ions and sulfate coexistence system had been studied, and then the following conclusions were obtained: the sulfate at this concentration had no effect on the determination, but the matrix effects or continuous background superposition which were generated by high concentration of vanadium ions had negative interference on the determination of potassium and sodium, and it produced a positive interference on the determination of the iron and other impurity elements, so that the impacts of high vanadium matrix were eliminated by the matrix matching and combining synchronous background correction measures. Through the spectral interference test, the paper classification summarized the spectral interferences of vanadium matrix and between the impurity elements, and the analytical lines, the background correction regions and working parameters of the spectrometer were all optimized. The technical performance index of the analysis method is that the background equivalent concentration -0.0003%(Na)~0.0004%(Cu), the detection limit of the element is 0.0001%∼ 0.0003%, RSDscope of the method of detection, recoveries is 91.0% ∼ 110.0%.

  19. Elemental analysis of glass by laser ablation inductively coupled plasma optical emission spectrometry (LA-ICP-OES).

    Science.gov (United States)

    Schenk, Emily R; Almirall, José R

    2012-04-10

    The elemental analysis of glass evidence has been established as a powerful discrimination tool for forensic analysts. Laser ablation inductively coupled plasma optical emission spectrometry (LA-ICP-OES) has been compared to laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) and energy dispersive micro X-ray fluorescence spectroscopy (μXRF/EDS) as competing instrumentation for the elemental analysis of glass. The development of a method for the forensic analysis of glass coupling laser ablation to ICP-OES is presented for the first time. LA-ICP-OES has demonstrated comparable analytical performance to LA-ICP-MS based on the use of the element menu, Al (Al I 396.15 nm), Ba (Ba II 455.40 nm), Ca (Ca II 315.88 nm), Fe (Fe II 238.20 nm), Li (Li I 670.78 nm), Mg (Mg I 285.21 nm), Sr (Sr II 407.77 nm), Ti (Ti II 368.51 nm), and Zr (Zr II 343.82 nm). The relevant figures of merit, such as precision, accuracy and sensitivity, are presented and compared to LA-ICP-MS. A set of 41 glass samples was used to assess the discrimination power of the LA-ICP-OES method in comparison to other elemental analysis techniques. This sample set consisted of several vehicle glass samples that originated from the same source (inside and outside windshield panes) and several glass samples that originated from different vehicles. Different match criteria were used and compared to determine the potential for Type I and Type II errors. It was determined that broader match criteria is more applicable to the forensic comparison of glass analysis because it can reduce the affect that micro-heterogeneity inherent in the glass fragments and a less than ideal sampling strategy can have on the interpretation of the results. Based on the test set reported here, a plus or minus four standard deviation (± 4s) match criterion yielded the lowest possibility of Type I and Type II errors. The developed LA-ICP-OES method has been shown to perform similarly to LA-ICP-MS in the

  20. Sputtering and surface structure modification of gold thin films deposited onto silicon substrates under the impact of 20–160 keV Ar{sup +} ions

    Energy Technology Data Exchange (ETDEWEB)

    Mammeri, S., E-mail: smammeri@yahoo.fr [Centre de Recherche Nucléaire d’Alger, B.P. 399, 02 Bd. Frantz Fanon, Alger-Gare, Algiers (Algeria); Ouichaoui, S. [Université des Sciences et de la Technologie H. Boumediene (USTHB), Faculté de Physique, Laboratoire SNIRM, B.P. 32, El-Alia, 16111 Bab Ezzouar, Algiers (Algeria); Ammi, H.; Dib, A. [Centre de Recherche Nucléaire d’Alger, B.P. 399, 02 Bd. Frantz Fanon, Alger-Gare, Algiers (Algeria)

    2014-10-15

    Highlights: •Sputter yields were measured for gold thin films under keV Ar{sup +} ion bombardment. •RBS analysis was used to derive energy dependence of sputtering yield. •Surface effects under Ar{sup +} ion irradiation were studied by SEM and XRD analyses. -- Abstract: The induced sputtering and surface state modification of Au thin films bombarded by swift Ar{sup +} ions under normal incident angle have been studied over an energy range of (20–160) keV using three complementary techniques: Rutherford backscattering spectroscopy (RBS), scanning electron microscopy (SEM) and X-ray diffraction (XRD). The sputtering yields determined by RBS measurements using a 2 MeV {sup 4}He{sup +} ion beam were found to be consistent with previous data measured within the Ar{sup +} ion energy region E ⩽ 50 keV, which are thus extended to higher bombarding energies. Besides, the SEM and XRD measurements clearly point out that the irradiated Au film surfaces undergo drastic modifications with increasing the Ar{sup +} ion energy, giving rise to the formation of increasingly sized grains of preferred (1 1 1) crystalline orientations. The relevance of different sputtering yield models for describing experimental data is discussed with invoking the observed surface effects induced by the Ar{sup +} ion irradiation.

  1. Investigation of the electrocatalytic activity for oxygen reduction of sputter deposited mixed metal films

    International Nuclear Information System (INIS)

    Schumacher, L.C.; Holzheuter, I.B.; Nucara, M.C.; Dignam, M.J.

    1989-01-01

    Sputter-deposited films of silver with lead, manganese and nickel have been studied as possible oxygen reduction electrocatalysts using cyclic voltammetry, rotating disc studies, steady-state polarization and Auger analysis. In general, the Ag-Pb and Ag-Mn films display superior electrocatalytic activity for O 2 reduction, while the Ag-Ni films' performance is inferior to that of pure Ag. For the Ag-Pb films, which show the highest electrocatalytic activity, the mixed metal films display oxidation-reduction behavior which is not simply a superposition of that of the separate metals, and suggests a mechanism for the improved behavior

  2. HRTEM Microstructural Characterization of ?-WO3 Thin Films Deposited by Reactive RF Magnetron Sputtering

    OpenAIRE

    Faudoa-Arzate, A.; Arteaga-Dur?n, A.; Saenz-Hern?ndez, R.J.; Botello-Zubiate, M.E.; Realyvazquez-Guevara, P.R.; Matutes-Aquino, J.A.

    2017-01-01

    Though tungsten trioxide (WO3) in bulk, nanosphere, and thin film samples has been extensively studied, few studies have been dedicated to the crystallographic structure of WO3 thin films. In this work, the evolution from amorphous WO3 thin films to crystalline WO3 thin films is discussed. WO3 thin films were fabricated on silicon substrates (Si/SiO2) by RF reactive magnetron sputtering. Once a thin film was deposited, two successive annealing treatments were made: an initial annealing at 400...

  3. Assessment of heavy metal contamination in core sediment samples in Gulf of Izmir, Aegean Sea, Turkey (by inductively coupled plasma-optical emission spectrometry (ICP-OES))

    Science.gov (United States)

    Ünal Yumun, Zeki; Kam, Erol; Kurt, Dilek

    2017-04-01

    Heavy metal and radionuclide analysis studies are crucial in explaining biotic and abiotic interactions in ecosystems. This type of analysis is highly needed in environments such as coastal areas, gulfs or lakes where human activities are generally concentrated. Sediments are one of the best biological indicators for the environment since the pollution accumulates in the sediments by descent to the sea floor. In this study, sediments were collected from the Gulf of Izmir (Eastern Aegean Sea, Turkey) considering the accumulated points of domestic and industrial wastes to make an anthropogenic pollution analysis. The core sediments had different depths of 0.00-30.00 m at four different locations where Karsiyaka, Bayrakli, Incialti and Cesmealti in the Gulf of Izmir. The purpose of the study was determining Cd, Co, Cr, Cu, Mn, Ni, Pb, and Zn concentrations in the drilling samples to assess their levels and spatial distribution in crucial areas of the Aegean Sea by inductively coupled plasma-optical emission spectrometry (ICP-OES) with microwave digestion techniques. The heavy metal concentrations found in sediments varied for Cd: OES, pollution, sediment.

  4. Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

    Science.gov (United States)

    Anders, André

    2017-05-01

    High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. By applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized. In contrast to conventional magnetron sputtering, HiPIMS is characterized by self-sputtering or repeated gas recycling for high and low sputter yield materials, respectively, and both for most intermediate materials. The dense plasma in front of the target has the dual function of sustaining the discharge and providing plasma-assistance to film growth, affecting the microstructure of growing films. Many technologically interesting thin films are compound films, which are composed of one or more metals and a reactive gas, most often oxygen or nitrogen. When reactive gas is added, non-trivial consequences arise for the system because the target may become "poisoned," i.e., a compound layer forms on the target surface affecting the sputtering yield and the yield of secondary electron emission and thereby all other parameters. It is emphasized that the target state depends not only on the reactive gas' partial pressure (balanced via gas flow and pumping) but also on the ion flux to the target, which can be controlled by pulse parameters. This is a critical technological opportunity for reactive HiPIMS (R-HiPIMS). The scope of this tutorial is focused on plasma processes and mechanisms of operation and only briefly touches upon film properties. It introduces R-HiPIMS in a systematic, step-by-step approach by covering sputtering, magnetron sputtering, reactive magnetron sputtering, pulsed reactive magnetron sputtering, HiPIMS, and finally R-HiPIMS. The tutorial is concluded by considering variations of R-HiPIMS known as modulated pulsed power magnetron sputtering and deep-oscillation magnetron sputtering and combinations of R-HiPIMS with superimposed dc magnetron sputtering.

  5. Potential sputtering of protons from hydrogen- and H sub 2 O-terminated Si(1 0 0) surfaces with slow highly charged ions

    CERN Document Server

    Kuroki, K; Yamazaki, Y

    2003-01-01

    A potential sputtering mechanism of hydrogen has been studied for impacts of slow highly charged Xe sup q sup + ions (<5 keV, q=4-12) on well-defined H-terminated and water-saturated Si(1 0 0) surfaces. It was found that the sputtering yields of protons were proportional to q supgamma (gamma approx 5) for both the Si(1 0 0)2x1-H and Si(1 0 0)1x1-H surfaces, although the absolute yield for the Si(1 0 0)1x1-H surface was 10 times larger than that for the Si(1 0 0)2x1-H surface, i.e. the sputtering efficiency per one H-Si bond for the Si(1 0 0)1x1-H surface is five times larger that for the Si(1 0 0)2x1-H surface. The proton sputtering efficiency from a H-O-Si bond was extracted from measurements of the water-saturated surface, which was approx 8 times larger than the H-Si bond of the Si(1 0 0)2x1-H surface. An effective distance of the proton from its substrate was proposed to be the key parameter to govern the yield, which also influences the energy distributions of sputtered protons. These findings are con...

  6. Threshold voltage tuning in AlGaN/GaN HFETs with p-type Cu2O gate synthesized by magnetron reactive sputtering

    Science.gov (United States)

    Wang, Lei; Li, Liuan; Xie, Tian; Wang, Xinzhi; Liu, Xinke; Ao, Jin-Ping

    2018-04-01

    In present study, copper oxide films were prepared at different sputtering powers (10-100 W) using magnetron reactive sputtering. The crystalline structure, surface morphologies, composition, and optical band gap of the as-grown films are dependent on sputtering power. As the sputtering power decreasing from 100 to 10 W, the composition of films changed from CuO to quasi Cu2O domination. Moreover, when the sputtering power is 10 W, a relative high hole carrier density and high-surface-quality quasi Cu2O thin film can be achieved. AlGaN/GaN HFETs were fabricated with the optimized p-type quasi Cu2O film as gate electrode, the threshold voltage of the device shows a 0.55 V positive shift, meanwhile, a lower gate leakage current, a higher ON/OFF drain current ratio of ∼108, a higher electron mobility (1465 cm2/Vs), and a lower subthreshold slope of 74 mV/dec are also achieved, compared with the typical Ni/Au-gated HFETs. Therefore, Cu2O have a great potential to develop high performance p-type gate AlGaN/GaN HFETs.

  7. Fabrication of Multiferroic Co-Substituted BiFeO3 Epitaxial Films on SrTiO3 (100 Substrates by Radio Frequency Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Yasuo Ando

    2011-06-01

    Full Text Available The 10 at.% Co-substituted BiFeO3 films (of thickness 50 nm were successfully prepared by radio frequency (r.f. magnetron sputtering on SrTiO3 (100 substrates with epitaxial relationships of [001](001Co-BiFeO3//[001](001SrTiO3. In this study, a single phase Co-substituted BiFeO3 epitaxial film was fabricated by r.f. magnetron sputtering. Sputtering conditions such as Ar, O2 gas pressure, annealing temperature, annealing atmosphere, and sputtering power were systematically changed. It was observed that a low Ar gas pressure and low sputtering power is necessary to suppress the formation of the secondary phases of BiOx. The Co-substituted BiFeO3 films were crystalized with post-annealing at 600 °C in air. The process window for single phase films is narrower than that for pure BiFeO3 epitaxial films. By substituting Fe with Co in BiFeO3, the magnetization at room temperature increased to 20 emu/cm3. This result suggests that Co-substituted BiFeO3 films can be used in spin-filter devices.

  8. Growth of the [110] oriented TiO2 nanorods on ITO substrates by sputtering technique for dye-sensitized solar cells

    Directory of Open Access Journals (Sweden)

    LIJIAN eMENG

    2014-09-01

    Full Text Available TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It has been found that the sputtering pressure is a very important parameter for the structure of the deposited TiO2 films. When the pressure is lower than 1 Pa, the deposited film has a dense structure and shows a preferred orientation along the [101] direction. However, the nanorod structure has been obtained as the sputtering pressure is higher than 1 Pa. These nanorods structure TiO2 film shows a preferred orientation along the [110] direction. The phases of the deposited TiO2 films have been characterized by the x-ray diffraction and the Raman scattering measurements. All the films show an anatase phase and no other phase has been observed. The results of the SEM show that these TiO2 nanorods are perpendicular to the ITO substrate. The TEM measurement shows that the nanorods have a very rough surface. The dye-sensitized solar cells (DSSCs have been assembled using these TiO2 nanorod films prepared at different sputtering pressures as photoelectrode. And the effect of the sputtering pressure on the properties of the photoelectric conversion of the DSSCs has been studied.

  9. Extraction inductively coupled plasma-optical emission spectrometry (ICP-OES). Determination of traces of phosphorus in tungsten

    International Nuclear Information System (INIS)

    Bauer, G.; Wegscheider, W.; Mueller, K.

    1989-01-01

    A method for the separation and preconcentration of traces of phosphorus from tungsten was developed. Solid phase extraction of the phosphovanadomolybdate complex performed on a micro-column was applied. Phosphorus was determined by optical emission spectroscopy (OES) with inductively coupled plasma (ICP) excitation. A limit of detection of 0,4 μg/g P with respect to the solid phase is obtained. By directly coupling the extraction/elution step to the ICP instrument a detection limit of 0,06 μg/g P in W was achieved. Besides, the complexity of spectral evaluation in ICP-OES determinations of traces in spectralline-rich matrices is discussed. (Authors)

  10. Volatile organic silicon compounds in biogases: development of sampling and analytical methods for total silicon quantification by ICP-OES.

    Science.gov (United States)

    Chottier, Claire; Chatain, Vincent; Julien, Jennifer; Dumont, Nathalie; Lebouil, David; Germain, Patrick

    2014-01-01

    Current waste management policies favor biogases (digester gases (DGs) and landfill gases (LFGs)) valorization as it becomes a way for energy politics. However, volatile organic silicon compounds (VOSiCs) contained into DGs/LFGs severely damage combustion engines and endanger the conversion into electricity by power plants, resulting in a high purification level requirement. Assessing treatment efficiency is still difficult. No consensus has been reached to provide a standardized sampling and quantification of VOSiCs into gases because of their diversity, their physicochemical properties, and the omnipresence of silicon in analytical chains. Usually, samplings are done by adsorption or absorption and quantification made by gas chromatography-mass spectrometry (GC-MS) or inductively coupled plasma-optical emission spectrometry (ICP-OES). In this objective, this paper presents and discusses the optimization of a patented method consisting in VOSiCs sampling by absorption of 100% ethanol and quantification of total Si by ICP-OES.

  11. Kinetic and Potential Sputtering of Lunar Regolith: The Contribution of the Heavy Highly Charged (Minority) Solar Wind Ions

    Science.gov (United States)

    Meyer, F. W.; Barghouty, A. F.

    2012-01-01

    Solar wind sputtering of the lunar surface helps determine the composition of the lunar exosphere and contributes to surface weathering. To date, only the effects of the two dominant solar wind constituents, H+ and He+, have been considered. The heavier, less abundant solar wind constituents have much larger sputtering yields because they have greater mass (kinetic sputtering) and they are highly charged (potential sputtering) Their contribution to total sputtering can therefore be orders of magnitude larger than their relative abundances would suggest

  12. Characterization of arsenic-contaminated aquifer sediments from eastern Croatia by ion microbeam, PIXE and ICP-OES techniques

    Energy Technology Data Exchange (ETDEWEB)

    Ujević Bošnjak, M., E-mail: magdalena.ujevic@hzjz.hr [Croatian National Institute of Public Health, Rockefelerova 7, 10000 Zagreb (Croatia); Fazinić, S. [Institute Ruđer Bošković, Bijenička cesta, 10000 Zagreb (Croatia); Duić, Ž. [University of Zagreb, Faculty of Mining, Geology and Petroleum Engineering, Pierottijeva 6, Zagreb (Croatia)

    2013-10-01

    Highlights: •ICP-OES and PIXE used in the characterization of As-contaminated sediments. •Observed high correlations between the results obtained by those techniques. •Discrepancies observed for Mn, and for the highest As concentrations. •Microbeam analyses showed As association with sulphides and iron. -- Abstract: Groundwater arsenic contamination has been evidenced in eastern Croatia and hydrochemical results suggest that the occurrence of arsenic in the groundwater depends on the local geology, hydrogeology, and geochemical characteristics of the aquifer. In order to perform the sediment characterization and to investigate arsenic association with the other elements in the sediments, 10 samples from two boreholes (PVc-3 and Gundinci 1) in eastern Croatia were analyzed using two techniques: PIXE (without sample pre-treatment) and ICP-OES (after digestion), as well by ion microbeam analyses. The results of the PIXE and ICP-OES techniques showed quite good agreement; however, greater discrepancies were observed at the higher arsenic and manganese mass ratios. According to both techniques, higher As mass ratios were observed in the sediments from the PVc-3 core (up to 651 mg/kg and 491 mg/kg using PIXE and ICP-OES analyses respectively) than from the Gundinci 1 core (up to 60 mg/kg using both techniques). Although arsenic association with Fe is expected, no correlation was observed. The microbeam analyses demonstrated that arsenic is associated with sulphides and iron in the most As-contaminated sample from the PVc-3 core, while this relationship was not evident in the most As-contaminated sample from the Gundinci 1 borehole.

  13. [Determination of metal elements in PM2. 5 by ICP-OES with microwave digestion].

    Science.gov (United States)

    Zhang, Liu-Yi; Fu, Chuan; Yang, Fu-Mo; Yang, Ji-Dong; Huang, Yi-Min; Zhang, Qiang; Wu, Bing-Yu

    2014-11-01

    In the present work, a method was developed for determining lead, zinc, copper, cadmium, znd chromium in PM2. 5 by inductively coupled plasma-optical emission spectrometry (ICP-OES) analysis with microwave digestion and glass fibre filter collection of samples. The microwave digestion systems were investigated and the experimental conditions were optimized. The results show that (1) HNO3-H2O02 digestion system is more stable and complete than HNO3-HCl and HNO3-H2 SO4 digestion systems; (2) The most sensitive emission wave length of lead, zinc, copper, cadmium, and chromium are 220.353, 213.857, 327.393, 228.802, and 267.716 nm, respectively; (3) The highest signal-to-noise ratios were observed under the conditions: RF power of 1 300 W, peristaltic pump flow rate of 1.5 mL x min(-1), cooling gas flow rate of 15 L x min(-1), and carrier gas flow rate of 0.8 L x min(-1). In addition, the detection limit for these elements ranged between 2.02 x 10(-3) and 8.20 x 10(-3(μg x mL(-1), the relative standard deviations (RSD, n = 6) for the samples were in the range of 1.86%-2.82%, and the recovery for the elements determined was from 91.6% to 103.7%. The proposed method was used for determination of the above five elements in atmospheric fine particulate matter at Wanzhou Monitoring Site of Chongqing Institute of Green and Intelligent Technology. The results revealed that the atmospheric fine particulate matter at this monitoring site was not polluted by cadmium and chromium, lead was at the level of potential contamination, while zinc and copper were at the level of slight pollution.

  14. Electrical characterization of high-pressure reactive sputtered ScOx films on silicon

    International Nuclear Information System (INIS)

    Castan, H.; Duenas, S.; Gomez, A.; Garcia, H.; Bailon, L.; Feijoo, P.C.; Toledano-Luque, M.; Prado, A. del; San Andres, E.; Lucia, M.L.

    2011-01-01

    Al/ScO x /SiN x /n-Si and Al/ScO x /SiO x /n-Si metal-insulator-semiconductor capacitors have been electrically characterized. Scandium oxide was grown by high-pressure sputtering on different substrates to study the dielectric/insulator interface quality. The substrates were silicon nitride and native silicon oxide. The use of a silicon nitride interfacial layer between the silicon substrate and the scandium oxide layer improves interface quality, as interfacial state density and defect density inside the insulator are decreased.

  15. Structural and optical properties of zinc oxide film using RF-sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Hashim, A. J.; Jaafar, M. S.; Ghazai, Alaa J. [Nano-Optoelectronics Research and Technology Laboratory, School of Physics, Universiti Sains Malaysia, 11800 Pinang (Malaysia); Physics Department, Science College, Thi-Qar University (Iraq)

    2012-11-27

    This paper reports the fabrication of zinc oxide (ZnO) film using RF-sputtering technique. Determination of the structural properties using High Resolution X-ray Diffraction (HRXRD) confirmed that ZnO film deposited on silicon (Si) substrate has a high quality. This result is in line with the Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM) which were used to image the morphology of the film, in which a rough surface was demonstrated. Photoluminescence (PL) emission is included to study the optical properties of ZnO film that shows two PL peak in the UV region at 371 nm and in visible region at 530 nm respectively.

  16. Combinatorial magnetron sputtering of AgFeO2 thin films with the delafossite structure

    OpenAIRE

    Mao, Fang; Nyberg, Tomas; Thersleff, Thomas; Andersson, Anna; Jansson, Ulf

    2016-01-01

    The main objective of this study is to demonstrate the strength of the combinatorial approach to rapidly and effectively identify suitable process parameters for the synthesis of AgFeO2 filmswith layered delafossite structure. (00l)- textured delafossite AgFeO2 thin films have been successfully deposited for the first time without post-annealing by magnetron sputtering from elemental silver and iron targets in a reactive Ar-O-2 atmosphere. Gradient filmswith a wide composition range were depo...

  17. Improving the Tribological Properties of Spark-Anodized Titanium by Magnetron Sputtered Diamond-Like Carbon

    OpenAIRE

    Zhaoxiang Chen; Xipeng Ren; Limei Ren; Tengchao Wang; Xiaowen Qi; Yulin Yang

    2018-01-01

    Spark-anodization of titanium can produce adherent and wear-resistant TiO2 film on the surface, but the spark-anodized titanium has lots of surface micro-pores, resulting in an unstable and high friction coefficient against many counterparts. In this study, the diamond-like carbon (DLC) was introduced into the micro-pores of spark-anodized titanium by the magnetron sputtering technique and a TiO2/DLC composite coating was fabricated. The microstructure and tribological properties of TiO2/DLC ...

  18. High frequency pulse anodising of magnetron sputtered Al–Zr and Al–Ti Coatings

    DEFF Research Database (Denmark)

    Gudla, Visweswara Chakravarthy; Bordo, Kirill; Engberg, Sara

    2016-01-01

    High frequency pulse anodising of Al–Zr and Al–Ti coatings is studied as a surface finishing technique and compared to conventional decorative DC anodising. The Al–Zr and Al–Ti coatings were deposited using DC magnetron sputtering and were heat treated after deposition to generate a multiphase...... microstructure with Al3Zr and Al3Ti intermetallic phases in α-Al matrix. The effect of the Zr/Ti content and the anodising potential on the anodising rate, the optical appearance and the microstructure is investigated. Characterisation of the surfaces was performed using transmission electron microscopy, grazing...

  19. Fabricating vertically aligned ultrathin graphene nanosheets without any catalyst using rf sputtering deposition

    Energy Technology Data Exchange (ETDEWEB)

    Deng, Jian-Hua [College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin 300387 (China); Wu, Shao-Long; Yang, Yu-Mei; Zheng, Rui-Ting [Key Laboratory of Beam Technology and Material Modification of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875 (China); Cheng, Guo-An, E-mail: gacheng@bnu.edu.cn [Key Laboratory of Beam Technology and Material Modification of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875 (China)

    2013-07-15

    Ultrathin graphene nanosheets (GNSs) were synthesized on Si substrates by using radio frequency sputtering deposition. SEM, TEM and Raman were employed to characterize the GNSs. The GNSs are well aligned on the Si substrates with sharp edges separated and unfolded outside. The TEM observation shows that most of the GNSs are less than 10 layers. The field emission properties of the GNSs synthesized for 10 h were also studied. They show good field emission characteristics, with a low turn-on electric field of 2.522 V/μm, a large field enhancement factor, and excellent stability behavior, suggesting promising prospects in the application of field electron emitting devices.

  20. Silicon oxide sacrificial layers deposited by pulsed-DC magnetron sputtering for MEMS applications

    Science.gov (United States)

    González-Castilla, Sheila; Olivares, Jimena; Clement, Marta; Vergara, Lucía; Pulido, Laura; Iborra, Enrique; Sangrador, Jesús

    2009-05-01

    Surface micromachining requires the use of easily-removable sacrificial layers fully compatible with all the materials and technological processes involved. Silicon dioxide films, thermally grown on silicon substrates or deposited by CVD, are commonly used as sacrificial layers in surface micromachining technologies, despite their low lateral etch rate in conventional fluorinate solutions. The development of silicon oxide layers with high etch rates poses a great technological challenge. In this work we have investigated the possibility of obtaining easily removable silicon oxide layers by pulsed-DC magnetron reactive sputtering. We have carried out a comprehensive study of the influence of the deposition parameters (total pressure and gas composition) on the composition, residual stress and lateral etch rate in fluorine wet solutions of the films. This study has allowed to determine the sputtering conditions to deposit, at very high rates (up to 0.1 μm/min), silicon oxide films with excellent characteristics for their use as sacrificial layers. Films with roughness around 5 nm rms, residual stress below 100 MPa and very high etch rate (up to 5 μm/min in the lateral directions), around 70 times greater than for thermal silicon oxide, have been achieved. The structural characteristics of these easily removable silicon oxide layers have been assessed by infrared spectroscopy and atomic force microscopy, which have revealed that the films exhibit some kind of porous structure, related to very specific sputter conditions. Finally, the viability of these films has been demonstrated by using them as sacrificial layer in the fabrication process of AlN-based microresonators.

  1. Hollow-fibre liquid phase microextraction for separation and preconcentration of vanadium species in natural waters and their determination by electrothermal vaporization-ICP-OES.

    Science.gov (United States)

    Li, Li; Hu, Bin

    2007-04-30

    For separation and determination of vanadium(IV/V) species, a fast and sensitive method by combining hollow-fibre liquid phase microextraction (HF-LPME) with electrothermal vaporization (ETV)-ICP-OES has been developed. Two vanadium species (V(IV) and V(V)) were separated by HF-LPME with the use of ammonium pyrrolidinecarbodithioate (APDC) as chelating agent for complexing with different V species and carbon tetrachloride as the extraction solvent, and the vanadium in the post-extraction organic phase was injected into the graphite furnace for ETV-ICP-OES detection, in which APDC was acted as the chemical modifier. At pH 5.0, both V(IV)-APDC and V(V)-APDC were extracted quantitatively into CCl(4) for determination of total V. For speciation studies, 1,2-cyclohexanediaminetetraacetic acid (CDTA) was added to the sample for masking V(IV), so that only V(V)-APDC was extracted and determined. The concentration of V(IV) was calculated by subtracting the V(V) concentration from the total concentration of V. Under the optimized experimental conditions, the enrichment factor was 74 and the detection limits for V(IV) and V(V) were 86pgmL(-1) and 71pgmL(-1), respectively. The proposed method has been applied to the speciation of V in environmental water samples, and the recovery was in the range of 94%-107%. The results show that V(V) is the dominant existence form in oxygenic water and V(IV) could not been detected. In order to validate the developed procedure, a NIES No.8 vehicle exhaust particulates certified reference material was analyzed, and the results obtained for total vanadium are in good agreement with the certified values. The proposed method is simple, rapid, selective, and sensitive and no oxidation/reduction is required, it is applicable to the speciation of vanadium in environmental samples with the complicated matrix.

  2. Tribological properties, corrosion resistance and biocompatibility of magnetron sputtered titanium-amorphous carbon coatings

    Energy Technology Data Exchange (ETDEWEB)

    Dhandapani, Vishnu Shankar [PG & Research Department of Physics, PSG College of Arts & Science, Coimbatore 641 014, Tamil Nadu (India); Center for Nano-Wear, Yonsei University, Seoul 120-749 (Korea, Republic of); Subbiah, Ramesh [Center for Biomaterials, Korea Institute of Science and Technology (KIST), Seoul 136-791 (Korea, Republic of); Department of Biomedical Engineering, Korea University of Science and Technology (UST), Daejon 305-333 (Korea, Republic of); Thangavel, Elangovan [PG & Research Department of Physics, PSG College of Arts & Science, Coimbatore 641 014, Tamil Nadu (India); Center for Nano-Wear, Yonsei University, Seoul 120-749 (Korea, Republic of); Arumugam, Madhankumar [Center of Research Excellence in Corrosion, King Fahd University of Petroleum and Minerals, Dhahran 31261 (Saudi Arabia); Park, Kwideok [Center for Biomaterials, Korea Institute of Science and Technology (KIST), Seoul 136-791 (Korea, Republic of); Department of Biomedical Engineering, Korea University of Science and Technology (UST), Daejon 305-333 (Korea, Republic of); Gasem, Zuhair M. [Center of Research Excellence in Corrosion, King Fahd University of Petroleum and Minerals, Dhahran 31261 (Saudi Arabia); Veeraragavan, Veeravazhuthi, E-mail: vv.vazhuthi@gmail.com [PG & Research Department of Physics, PSG College of Arts & Science, Coimbatore 641 014, Tamil Nadu (India); Kim, Dae-Eun, E-mail: kimde@yonsei.ac.kr [Center for Nano-Wear, Yonsei University, Seoul 120-749 (Korea, Republic of); Department of Mechanical Engineering, Yonsei University, Seoul 120-749 (Korea, Republic of)

    2016-05-15

    Highlights: • a-C:Ti nanocomposite coatings were prepared on 316L stainless steel by using R.F. magnetron sputtering method. • Properties of the nanocomposite coatings were analyzed with respect to titanium content. • Corrosion resistance, biocompatibility and hydrophobicity of nanocomposite coating were enhanced with increasing titanium content. • Coating with 2.33 at.% titanium showed superior tribological properties compared to other coatings. - Abstract: Amorphous carbon incorporated with titanium (a-C:Ti) was coated on 316L stainless steel (SS) by magnetron sputtering technique to attain superior tribological properties, corrosion resistance and biocompatibility. The morphology, topography and functional groups of the nanostructured a-C:Ti coatings in various concentrations were analyzed using atomic force microscopy (AFM), Raman, X-Ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). Raman and XPS analyses confirmed the increase in sp{sup 2} bonds with increasing titanium content in the a-C matrix. TEM analysis confirmed the composite nature of the coating and the presence of nanostructured TiC for Ti content of 2.33 at.%. This coating showed superior tribological properties compared to the other a-C:Ti coatings. Furthermore, electrochemical corrosion studies were performed against stimulated body fluid medium in which all the a-C:Ti coatings showed improved corrosion resistance than the pure a-C coating. Preosteoblasts proliferation and viability on the specimens were tested and the results showed that a-C:Ti coatings with relatively high Ti (3.77 at.%) content had better biocompatibility. Based on the results of this work, highly durable coatings with good biocompatibility could be achieved by incorporation of optimum amount of Ti in a-C coatings deposited on SS by magnetron sputtering technique.

  3. Non-uniform plasma distribution in dc magnetron sputtering: origin, shape and structuring of spokes

    Science.gov (United States)

    Panjan, Matjaž; Loquai, Simon; Ewa Klemberg-Sapieha, Jolanta; Martinu, Ludvik

    2015-12-01

    Non-homogeneous plasma distribution in the form of organized patterns called spokes was first observed in high power impulse magnetron sputtering (HiPIMS). In the present work we investigate the spoke phenomenon in non-pulsed low-current dc magnetron sputtering (DCMS). Using a high-speed camera the spokes were systematically studied with respect to discharge current, pressure, target material and magnetic field strength. Increase in the discharge current and/or gas pressure resulted in the sequential formation of two, then three and more spokes. The observed patterns were reproducible for the same discharge conditions. Spokes at low currents and pressures formed an elongated arrowhead-like shape and were commonly arranged in symmetrical patterns. Similar spoke patterns were observed for different target materials. When using a magnetron with a weaker magnetic field, spokes had an indistinct and diffuse shape, whereas in stronger magnetic fields spokes exhibited an arrowhead-like shape. The properties of spokes are discussed in relation to the azimuthally dependent electron-argon interactions. It is suggested that a single spoke is formed due to local gas breakdown and subsequent electron drift in the azimuthal direction. The spoke is self-sustained by electrons drifting in complex electric and magnetic fields that cause and govern azimuthally dependent processes: ionization, sputtering, and secondary electron emission. In this view plasma evolves from a single spoke into different patterns when discharge conditions are changed either by the discharge current, pressure or magnetic field strength. The azimuthal length of the spoke is associated with the electron-Ar collision frequency which increases with pressure and results in shortening of spoke until an additional spoke forms at a particular threshold pressure. It is proposed that the formation of additional spokes at higher pressures and discharge currents is, in part, related to the increased transport of

  4. Resonance ionization of sputtered atoms: Progress toward a quantitative technique

    International Nuclear Information System (INIS)

    Calaway, W.F.; Pellin, M.J.; Young, C.E.; Whitten, J.E.; Gruen, D.M.; Coon, S.R.; Texas Univ., Austin, TX; Wiens, R.C.; Burnett, D.S.; Stingeder, G.; Grasserbauer, M.

    1992-01-01

    The combination of RIMS and ion sputtering has been heralded as the ideal means of quantitatively probing the surface of a solid. While several laboratories have demonstrated the extreme sensitivity of combining RIMS with sputtering, less effort has been devoted to the question of accuracy. Using the SARISA instrument developed at Argonne National Laboratory, a number of well-characterized metallic samples have been analyzed. Results from these determinations have been compared with data obtained by several other analytical methods. One significant finding is that impurity measurements down to ppb levels in metal matrices can be made quantitative by employing polycrystalline metal foils as calibration standards. This discovery substantially reduces the effort required for quantitative analysis since a single standard can be used for determining concentrations spanning nine orders of magnitude

  5. Grafting of Gold Nanoparticles on Glass Using Sputtered Gold Interlayers

    Directory of Open Access Journals (Sweden)

    Ondřej Kvítek

    2014-01-01

    Full Text Available Three-step preparation of nanostructured Au layer on glass substrate is described. The procedure starts with sputtered gold interlayer, followed by grafting with dithiols and final coverage with gold nanoparticles (AuNPs. Successful binding of dithiols on the sputtered Au film was confirmed by X-ray photoelectron spectroscopy measurement. AuNPs bound to the surface were observed using atomic force microscopy. Both single nanoparticles and their aggregates were observed. UV-Vis spectra show broadening of surface plasmon resonance peak after AuNPs binding caused by aggregation of AuNPs on the sample surface. Zeta potential measurements suggest that a large part of the dithiol molecules are preferentially bound to the gold interlayer via both –SH groups.

  6. Characterization of magnetron sputtered surface coatings by AES

    International Nuclear Information System (INIS)

    Kahler, C.; Endstrasser, N.; Jaksch, S.; Scheier, P.

    2008-01-01

    Full text: Surface coatings produced by magnetron sputtering are investigated by STM and AES. Thin films of silicon nanoparticles are deposited on highly oriented pyrolytic graphite (HOPG) surfaces by magnetron sputtering. These silicon nanoparticle films are manipulated by means of a variable temperature UHV-STM, to realize lithography on the nanometer scale. Several factors affect the stability of the films and thereby the lifetime of the produced surface structures. To investigate the influence of these parameters, various methods like AFM, AES and XPS have to be applied. The dependence of the surface stability on the grade of oxidation is determined from the ratio between silicon and oxygen. This can be achieved by Auger electron spectroscopy. Our Auger spectrometer was modified in order to allow measuring the time development of the Auger spectrum during the oxidation process. Chemical images are generated by collecting an Auger spectrum at every spot as the primary electron beam is rastered across the sample surface. (author)

  7. Reflection mode XAFS investigations of reactively sputtered thin films.

    Science.gov (United States)

    Lützenkirchen-Hecht, D; Frahm, R

    2001-03-01

    Amorphous Ta-oxide and Sn-nitride thin films were prepared by reactive sputter deposition on smooth float glass substrates and investigated ex situ using reflection mode XAFS. The absorption coefficient mu and its fine structure were extracted from the measured reflection mode XAFS spectra with a method based on the Kramers-Kronig transform. Bond distances, coordination numbers and Debye-Waller factors were determined by a detailed XAFS data analysis and compared to those of reference compounds. In addition, changes of the atomic short range order of the sputter deposited Ta2O5-films induced by a thermal heat treatment in ambient air were examined as a function of the annealing temperature.

  8. Target surface condition during reactive glow discharge sputtering of copper

    International Nuclear Information System (INIS)

    Depla, D; Haemers, J; Gryse, R De

    2002-01-01

    During reactive glow discharge sputtering of copper in an argon/nitrogen plasma, we noticed an abrupt change of the target voltage and the deposition rate when the nitrogen concentration in the plasma exceeds a critical value. To explain this behaviour, the target surface after reactive glow discharge sputtering was examined by x-ray photoelectron spectroscopy (XPS). An experimental arrangement was constructed that allows direct transfer of the glow discharge cathode to the XPS analysis chamber without air exposure. These XPS measurements revealed that several different chemical states of nitrogen are present in the layer that forms on the target surface. The relative concentration of these different states changes when the critical nitrogen concentration in the plasma is exceeded

  9. Sputtering yield of Pu bombarded by fission Fragments from Cf

    Energy Technology Data Exchange (ETDEWEB)

    Danagoulian, Areg [Los Alamos National Laboratory; Klein, Andreas [Los Alamos National Laboratory; Mcneil, Wendy V [Los Alamos National Laboratory; Yuan, Vincent W [Los Alamos National Laboratory

    2008-01-01

    We present results on the yield of sputtering of Pu atoms from a Pu foil, bombarded by fission fragments from a {sup 252}Cf source in transmission geometry. We have found the number of Pu atoms/incoming fission fragments ejected to be 63 {+-} 1. In addition, we show measurements of the sputtering yield as a function of distance from the central axis, which can be understood as an angular distribution of the yield. The results are quite surprising in light of the fact that the Pu foil is several times the thickness of the range of fission fragment particles in Pu. This indicates that models like the binary collision model are not sufficient to explain this behavior.

  10. Molecular dynamic simulations of the sputtering of multilayer organic systems

    CERN Document Server

    Postawa, Z; Piaskowy, J; Krantzman, K; Winograd, N; Garrison, B J

    2003-01-01

    Sputtering of organic overlayers has been modeled using molecular dynamics computer simulations. The investigated systems are composed of benzene molecules condensed into one, two and three layers on an Ag left brace 1 1 1 right brace surface. The formed organic overlayers were bombarded with 4 keV Ar projectiles at normal incidence. The development of the collision cascade in the organic overlayer was investigated. The sputtering yield, mass, internal and kinetic energy distributions of ejected particles have been analyzed as a function of the thickness of the organic layer. The results show that all emission characteristics are sensitive to the variation of layer thickness. Although most of the ejected intact benzene molecules originate from the topmost layer, the emission of particles located initially in second and third layers is significant. The analysis indicates that the metallic substrate plays a dominant role in the ejection of intact organic molecules.

  11. Pumping mechanisms in sputter-ion pumps low pressure operation

    International Nuclear Information System (INIS)

    Welch, K.M.

    1991-01-01

    It is shown that significant H 2 pumping occurs in the walls of triode pumps. Also, H 2 is pumped in the anode cells of sputter-ion pumps. This pumping occurs in a manner similar to that by which the inert gases are pumped. That is, H 2 is pumped in the walls of the anode cells by high energy neutral burial. Hydrogen in the pump walls and anodes limits the base pressure of the pump

  12. Pumping mechanisms in sputter-ion pumps low pressure operation

    International Nuclear Information System (INIS)

    Welch, K.M.

    1991-01-01

    It is shown that significant H 2 pumping occurs in the walls of triode pumps. Also, H 2 is pumped in the anode cells of sputter-ion pumps. This pumping occurs in a manner similar to that by which the inert gases are pumped. That is, H 2 pumped in the walls of the anode cells by high energy neutral burial. Hydrogen in the pump walls and anodes limits the base pressure of the pump. 13 refs., 5 figs., 1 tab

  13. Sputtering analysis of silicates by XY-TOF-SIMS: Astrophysical applications

    Science.gov (United States)

    Martinez, Rafael; Langlinay, Thomas; Ponciano, Cassia; da Silveira, Enio F.; Palumbo, Maria Elisabetta; Strazzulla, Giovanni; Brucato, John R.; Hijazi, Hussein; Boduch, Philippe; Cassimi, Amine; Domaracka, Alicja; Ropars, Frédéric; Rothard, Hermann

    2015-08-01

    Silicates are the dominant material of many objects in the Solar System, e.g. asteroids, the Moon, the planet Mercury and meteorites. Ion bombardment by cosmic rays and solar wind may alter the reflectance spectra of irradiated silicates by inducing physico-chemical changes known as “space weathering”. Furthermore, sputtered particles contribute to the composition of the exosphere of planets or moons. Mercury’s complex particle environment surrounding the planet is composed by thermal and directional neutral atoms (exosphere) originating via surface release and charge-exchange processes, and by ionized particles originated through photo-ionization and again by surface release processes such as ion induced sputtering.As a laboratory approach to understand the evolution of the silicate surfaces and the Na vapor (as well as, in lower concentration, K and Ca) discovered on the solar facing side of Mercury, we measured sputtering yields, velocity spectra and angular distributions of secondary ions from terrestrial silicate analogs. Experiments were performed using highly charged MeV/u and keV/u ions at GANIL in a new UHV set-up (under well controlled surface conditions) [1]. Other experiments were conducted at the Pontifical Catholic University of Rio de Janeiro (PUC-Rio) by using Cf fission fragments (~ 1 MeV/u). Nepheline, an aluminosilicate containing Na and K, evaporated on Si substrates (wafers) was used as model for silicates present in Solar System objects. Production yields, measured as a function of the projectile fluence, allow to study the possible surface stoichiometry changes during irradiation. In addition, from the energy distributions N(E) of sputtered particles it is possible to estimate the fraction of particles that can escape from the gravitational field of Mercury, and those that fall back to the surface and contribute to populate the atmosphere (exosphere) of the planet.The CAPES-COFECUB French-Brazilian exchange program, a CNPq postdoctoral

  14. Tribological and structural properties of titanium nitride and titanium aluminum nitride coatings deposited with modulated pulsed power magnetron sputtering

    Science.gov (United States)

    Ward, Logan

    The demand for economical high-performance materials has brought attention to the development of advanced coatings. Recent advances in high power magnetron sputtering (HPPMS) have shown to improve tribological properties of coatings. These coatings offer increased wear and oxidation resistance, which may facilitate the use of more economical materials in harsh applications. This study demonstrates the use of novel forms of HPPMS, namely modulated pulsed-power magnetron sputtering (MPPMS) and deep oscillation magnetron sputtering (DOMS), for depositing TiN and Ti1-xAlxN tribological coatings on commonly used alloys, such as Ti-6Al-4V and Inconel 718. Both technologies have been shown to offer unique plasma characteristics in the physical vapor deposition (PVD) process. High power pulses lead to a high degree of ionization compared to traditional direct-current magnetron sputtering (DCMS) and pulsed magnetron sputtering (PMS). Such a high degree of ionization was previously only achievable by cathodic arc deposition (CAD); however, CAD can lead to increased macroparticles that are unfavorable in high friction and corrosive environments. MPPMS, DOMS, and other HPPMS techniques offer unique plasma characteristics and have been shown to produce coatings with refined grain structure, improved density, hardness, adhesion, and wear resistance. Using DOMS and MPPMS, TiN and Ti1-xAlxN coatings were deposited using PMS to compare microstructures and tribological performance. For Ti1-xAlxN, two sputtering target compositions, Ti 0.5Al0.5 and Ti0.3Al0.7, were used to evaluate the effects of MPPMS on the coating's composition and tribological properties. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), and X-ray diffraction (XRD) were used to characterize microstructure and crystallographic texture. Several tribological properties were evaluated including: wear rate, coefficient of friction, adhesion, and nanohardness. Results show that substrate

  15. Energy and mass dependence of isotopic enrichment in sputtering

    CERN Document Server

    Shutthanandan, V; Ray, P

    2003-01-01

    Silver, copper, and boron (from a boron nitride target) were sputtered with xenon ions. The isotopic composition of secondary ions of silver was measured at ion energies ranging from 300 eV to 3 keV and, for copper and boron, at 2.0, 2.5, and 3.0 keV. An ion gun was used to generate the ion beam. The secondary ions were detected at a small emission angle by a quadrupole mass spectrometer. The secondary-ion flux of silver was found to be enriched in heavy isotopes at lower incident-ion energies. The heavy-isotope enrichment was observed to decrease with increasing primary-ion energy. Beyond 500 eV, light isotopes of silver were sputtered preferentially with the enrichment increasing to a constant value of 1.018. The sputtered flux of copper and boron also indicated constant enrichments (1.008 and 1.281 for copper and boron respectively) in light isotopes at high ion energies. (orig.)

  16. Assessing Reliability of Cold Spray Sputter Targets in Photovoltaic Manufacturing

    Science.gov (United States)

    Hardikar, Kedar; Vlcek, Johannes; Bheemreddy, Venkata; Juliano, Daniel

    2017-10-01

    Cold spray has been used to manufacture more than 800 Cu-In-Ga (CIG) sputter targets for deposition of high-efficiency photovoltaic thin films. It is a preferred technique since it enables high deposit purity and transfer of non-equilibrium alloy states to the target material. In this work, an integrated approach to reliability assessment of such targets with deposit weight in excess of 50 lb. is undertaken, involving thermal-mechanical characterization of the material in as-deposited condition, characterization of the interface adhesion on cylindrical substrate in as-deposited condition, and developing means to assess target integrity under thermal-mechanical loads during the physical vapor deposition (PVD) sputtering process. Mechanical characterization of cold spray deposited CIG alloy is accomplished through the use of indentation testing and adaptation of Brazilian disk test. A custom lever test was developed to characterize adhesion along the cylindrical interface between the CIG deposit and cylindrical substrate, overcoming limitations of current standards. A cohesive zone model for crack initiation and propagation at the deposit interface is developed and validated using the lever test and later used to simulate the potential catastrophic target failure in the PVD process. It is shown that this approach enables reliability assessment of sputter targets and improves robustness.

  17. Functional nanostructured titanium nitride films obtained by sputtering magnetron

    International Nuclear Information System (INIS)

    Sanchez, O.; Hernandez-Velez, M.; Navas, D.; Auger, M.A.; Baldonedo, J.L.; Sanz, R.; Pirota, K.R.; Vazquez, M.

    2006-01-01

    Development of new methods in the formation of hollow structures, in particular, nanotubes and nanocages are currently generating a great interest as a consequence of the growing relevance of these nanostructures on many technological fields, ranging from optoelectronics to biotechnology. In this work, we report the formation of titanium nitride (TiN) nanotubes and nanohills via reactive sputtering magnetron processes. Anodic Alumina Membranes (AAM) were used as template substrates to grow the TiN nanostructures. The AAM were obtained through electrochemical anodization processes by using oxalic acid solutions as electrolytes. The nanotubes were produced at temperatures below 100 deg. C, and using a pure titanium (99.995%) sputtering target and nitrogen as reactive gas. The obtained TiN thin films showed surface morphologies adjusted to pore diameter and interpore distance of the substrates, as well as ordered arrays of nanotubes or nanohills depending on the sputtering and template conditions. High Resolution Scanning Electron Microscopy (HRSEM) was used to elucidate both the surface order and morphology of the different grown nanostructures. The crystalline structure of the samples was examined using X-ray Diffraction (XRD) patterns and their qualitative chemical composition by using X-ray Energy Dispersive Spectroscopy (XEDS) in a scanning electron microscopy

  18. Deposition and characterization of TaAIN thin films by reactive magnetron sputtering; Deposicao e caracterizacao de filmes finos de TaAIN depositados por magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Oliveira, G.B.; Fernandez, D.R.; Fontes Junior, A.S.; Felix, L.C.; Tentardini, E.K. [Universidade Federal de Sergipe (UFS), Sao Cristovao, SE (Brazil). Departamento de Ciencia e Engenharia de Materiais; Hubler, R. [Pontificia Universidade Catolica do Rio Grande do Sul (PUC-RS), RS (Brazil); Silva Junior, A.H. da, E-mail: brito-g@hotmail.com [Universidade Federal do Rio Grande do Sul (UFRGS), RS (Brazil)

    2016-07-01

    Phase stability, oxidation resistance and great mechanical properties are the main objectives when synthesizing protective coatings. The tantalum nitride (TaN) has aroused interest because of its high temperature stability, chemical inertness and thermal conductivity. However, it has a low hardness value when compared to other coatings. Researches has shown that one way to improvements in the properties of a thin film is by adding other elements in the deposition process. Therefore, the objective of this study was to deposit thin films of TaAlN by magnetron sputtering, changing the aluminum concentration of 2, 5, 7, to 14%. Then the coatings were characterized by EDS, RBS, GIXRD and nanohardness. In this study was found that the aluminum deposited did not change the oxidation resistance of the coating, and the highest value of hardness was 28 GPa for the sample with 14 at.%. (author)

  19. Ions ejected from the surface: sputtering induced by swift heavy ion irradiation

    International Nuclear Information System (INIS)

    Alzaher, I.

    2011-01-01

    Ion irradiation of solids leads to a deposition of its energy along the ion path. The energy deposited creates damage in the target as well as leads to the sputtering of neutral and charged particles. In this work we studied the damage induced by slow and swift ions in matter. We studied also the sputtering of secondary ions induced by swift heavy ion irradiation. We have measured the damage cross section of the surface of the Titanium (Insulator surface) and of the graphite (Conductor surface) by slow highly charged ions. The potential energy stored in the projectile has an important role for creating damage at surfaces. We studied the damage creation at the surface of crystalline silicon by swift heavy ions. We revealed that the c-Si is not sensitive to the irradiation by Xe ion at E c = 0,9 MeV/u, where the electronic stopping power is 12 keV/nm. The maximum efficiency to create a track is 0,3 %. Under swift heavy ion irradiation, the emission of the CaF + compared to the Ca + is higher for solid crystals than for thin films of Calcium Fluoride CaF 2 on Si. (author)

  20. Sputtering of Lunar Regolith Simulant by Protons and Multicharged Heavy Ions at Solar Wind Energies

    Energy Technology Data Exchange (ETDEWEB)

    Meyer, Fred W [ORNL; Harris, Peter R [ORNL; Taylor, C. N. [Purdue University; Meyer III, Harry M [ORNL; Barghouty, N. [NASA Marshall Space Flight Center, Huntsville, AL; Adams Jr., J. [NASA Marshall Space Flight Center, Huntsville, AL

    2011-01-01

    We report preliminary results on sputtering of a lunar regolith simulant at room temperature by singly and multiply charged solar wind ions using quadrupole and time-of-flight (TOF) mass spectrometry approaches. Sputtering of the lunar regolith by solar-wind heavy ions may be an important particle source that contributes to the composition of the lunar exosphere, and is a possible mechanism for lunar surface ageing and compositional modification. The measurements were performed in order to assess the relative sputtering efficiency of protons, which are the dominant constituent of the solar wind, and less abundant heavier multicharged solar wind constituents, which have higher physical sputtering yields than same-velocity protons, and whose sputtering yields may be further enhanced due to potential sputtering. Two different target preparation approaches using JSC-1A AGGL lunar regolith simulant are described and compared using SEM and XPS surface analysis.

  1. On performance limitations and property correlations of Al-doped ZnO deposited by radio-frequency sputtering

    DEFF Research Database (Denmark)

    Crovetto, Andrea; Ottsen, Tobias Sand; Stamate, Eugen

    2016-01-01

    The electrical properties of RF-sputtered Al-doped ZnO are often spatially inhomogeneous and strongly dependent on deposition parameters. In this work, we study the mechanisms that limit the minimum resistivity achievable under different deposition regimes. In a low- and intermediate......-pressure regime, we find a generalized dependence of the electrical properties, grain size, texture, and Al content on compressive stress, regardless of sputtering pressure or position on the substrate. In a high-pressure regime, a porous microstructure limits the achievable resistivity and causes it to increase...... over time as well. The primary cause of inhomogeneity in the electrical properties is identified as energetic particle bombardment. Inhomogeneity in oxygen content is also observed, but its effect on the electrical properties is small and limited to the carrier mobility....

  2. Effect of post-deposition annealing on the structural and electrical properties of RF sputtered hafnium oxide thin films

    Science.gov (United States)

    Das, K. C.; Ghosh, S. P.; Tripathy, N.; Bose, G.; Kar, J. P.

    2016-02-01

    Hafnium oxide films were deposited on silicon substrates by RF sputtering at room temperature. Post-deposition rapid thermal annealing of the sputtered HfO2 films was carried out in the temperature range of 400°C to 800°C in oxygen ambient. The structural properties ware studied by X-ray diffraction (XRD), where the enhancement in the crystallinity of HfO2 (1¯11) orientation was observed. The Capacitance —Voltage (C-V) and Current density —Voltage (J-V) characteristics of the annealed dielectric film were investigated employing Al/HfO2/Si Metal Oxide Semiconductor (MOS) capacitor structure. The flatband voltage (V fb ) and oxide charge density (Q ox ) were extracted from the high frequency (1 MHz) C-V curve. Leakage current was found to be minimum for the annealing temperature of 600°C.

  3. Investigation of electrical and optical properties of low temperature titanium nitride grown by rf-magnetron sputtering

    Science.gov (United States)

    Sosnin, D.; Kudryashov, D.; Mozharov, A.

    2017-11-01

    Titanium nitride is a promising material due to its low resistivity, high hardness and chemical inertness. Titanium nitride (TiN) can be applied as an ohmic contact for n-GaN and rectifying contact for p-GaN and also as a part of perovskite solar cell. A technology of TiN low temperature reactive rf-magnetron sputtering has been developed. Electrical and optical properties of titanium nitride were studied as a function of the rf-power and gas mixture composition. Reflectance and transmittance spectra were measured. Cross-section and surface SEM image were obtained. 250 nm thin films of TiN with a resistivity of 23.6 μOm cm were obtained by rf-magnetron sputtering at low temperature.

  4. Infrared metamaterial by RF magnetron sputtered ZnO/Al:ZnO multilayers

    Science.gov (United States)

    Santiago, Kevin C.; Mundle, Rajeh; White, Curtis; Bahoura, Messaoud; Pradhan, Aswini K.

    2018-03-01

    Hyperbolic metamaterials create artificial anisotropy using metallic wires suspended in dielectric media or alternating layers of a metal and dielectric (Type I or Type II). In this study we fabricated ZnO/Al:ZnO (AZO) multilayers by the RF magnetron sputtering deposition technique. Our fabricated multilayers satisfy the requirements for a type II hyperbolic metamaterial. The optical response of individual AZO and ZnO films, as well as the multilayered film were investigated via UV-vis-IR transmittance and spectroscopic ellipsometry. The optical response of the multilayered system is calculated using the nonlocal-corrected Effective Medium Approximation (EMA). The spectroscopic ellipsometry data of the multilayered system was modeled using a uniaxial material model and EMA model. Both theoretical and experimental studies validate the fabricated multilayers undergo a hyperbolic transition at a wavelength of 2.2 μm. To our knowledge this is the first AZO/ZnO type II hyperbolic metamaterial system fabricated by magnetron sputtering deposition method.

  5. Biocompatibility evaluation of sputtered zirconium-based thin film metallic glass-coated steels

    Directory of Open Access Journals (Sweden)

    Subramanian B

    2015-10-01

    Full Text Available Balasubramanian Subramanian,1 Sundaram Maruthamuthu,2 Senthilperumal Thanka Rajan1 1Electrochemical Material Science Division, 2Corrosion and Materials Protection Division, Central Electrochemical Research Institute, Karaikudi, India Abstract: Thin film metallic glasses comprised of Zr48Cu36Al8Ag8 (at.% of approximately 1.5 µm and 3 µm in thickness were prepared using magnetron sputtering onto medical grade 316L stainless steel. Their structural and mechanical properties, in vitro corrosion, and antimicrobial activity were analyzed. The amorphous thin film metallic glasses consisted of a single glassy phase, with an absence of any detectable peaks corresponding to crystalline phases. Elemental composition close to the target alloy was noted from EDAX analysis of the thin film. The surface morphology of the film showed a smooth surface on scanning electron microscopy and atomic force microscopy. In vitro electrochemical corrosion studies indicated that the zirconium-based metallic glass could withstand body fluid, showing superior resistance to corrosion and electrochemical stability. Interactions between the coated surface and bacteria were investigated by agar diffusion, solution suspension, and wet interfacial contact methods. The results indicated a clear zone of inhibition against the growth of microorganisms such as Escherichia coli and Staphylococcus aureus, confirming the antimicrobial activity of the thin film metallic glasses. Cytotoxicity studies using L929 fibroblast cells showed these coatings to be noncytotoxic in nature. Keywords: thin film metallic glasses, sputtering, biocompatibility, corrosion, antimicrobial activity

  6. Nano-structuring of PTFE surface by plasma treatment, etching, and sputtering with gold

    International Nuclear Information System (INIS)

    Reznickova, Alena; Kolska, Zdenka; Hnatowicz, Vladimir; Svorcik, Vaclav

    2011-01-01

    Properties of pristine, plasma modified, and etched (by water and methanol) polytetrafluoroethylene (PTFE) were studied. Gold nanolayers sputtered on this modified PTFE have been also investigated. Contact angle, measured by goniometry, was studied as a function of plasma exposure and post-exposure aging times. Degradation of polymer chains was examined by etching of plasma modified PTFE in water or methanol. The amount of ablated and etched layer was measured by gravimetry. In the next step the pristine, plasma modified, and etched PTFE was sputtered with gold. Changes in surface morphology were observed using atomic force microscopy. Chemical structure of modified polymers was characterized by X-ray photoelectron spectroscopy (XPS). Surface chemistry of the samples was investigated by electrokinetic analysis. Sheet resistance of the gold layers was measured by two-point technique. The contact angle of the plasma modified PTFE decreases with increasing exposure time. The PTFE amount, ablated by the plasma treatment, increases with the plasma exposure time. XPS measurements proved that during the plasma treatment the PTFE macromolecular chains are degraded and oxidized and new –C–O–C–, –C=O, and –O–C=O groups are created in modified surface layer. Surface of the plasma modified PTFE is weakly soluble in methanol and intensively soluble in water. Zeta potential and XPS shown dramatic changes in PTFE surface chemistry after the plasma exposure, water etching, and gold deposition. When continuous gold layer is formed a rapid decrease of the sheet resistance of the gold layer is observed.

  7. Spectroellipsometric investigation of optical, morphological, and structural properties of reactively sputtered polycrystalline AlN films

    International Nuclear Information System (INIS)

    Easwarakhanthan, T.; Hussain, S. S.; Pigeat, P.

    2010-01-01

    The optical and morphological properties of reactively sputtered AlN films on Si substrates have been studied in this work from a self-consistent three-layer optical model developed from spectroscopic-ellipsometry analysis and validated by observations from transmission-electron microscopy, Auger electron spectroscopy, and in situ reflectance interferometry. These properties correlate to the film microstructural properties. Accordingly, the almost thickness-independent refractive index of 2.01 of the bulk AlN layer indicates its polycrystalline microstructure. This layer also appears ungraded, homogeneous, isotropic, and free of excess Al, as if grown through a steady process. The small film absorption points to the Urbach tail states produced by the structural disorder typical of such sputtered films. The films' interface layer consists of a graded Bruggeman intermix of outdiffused Si and AlN materials spreading over 10-12 nm thickness. The surface morphology includes an Al 2 O 3 -oxidized outer rough surface gradually becoming AlN bulk with diminishing amounts of Al 2 O 3 and inner pores. The increase in the surface-layer thickness, as the film grows, indicates further surface roughening due to enlarging crystals in a disoriented growth. This spectroscopic-ellipsometry analysis of AlN films has allowed us to study the effect of substrate biasing on the AlN microstructure and to place forward a new processing method for the surface smoothening of rough AlN and diamond films.

  8. Self-sputtering during ion precipitation and its influence on niobium film properties

    International Nuclear Information System (INIS)

    Belevskij, V.P.; Gusev, I.V.

    1987-01-01

    Cathode sputtering of niobium films under conditions of vacuum condensation with simultaneous Nb + ion bombardment at energy of E n =(1.6...6.4)x10 -16 J is studied. Calculation of experimental values of the sputtering coefficient S Nb is performed with respect to the film thickness in the field of action of a niobium ion beam. Using the four-probe method in helium cryostats superconducting properties are studied and the film texture is determined by the X ray diffraction analysis. With the E n growth S Nb increases from 1.1 to 3.1. The best correspondence of the experimental dependence S Nb (E n ) is provided by the semiempirical formula of Yamamura Y. et al. The consequence of the S Nb increase is a sharp decrease of the effective condensation rate v eff . In case of niobium condensation at v eff m , where v m is the velocity of movement of a quasidiffusive boundary of impurities from the substrate according to the model of ion mixing developed by Carter G. and Armour D. suppresion of texture formation and deterioration of superconducting properties of superthin films (about 10 nm) is observed that results from ion mixing of the film and substrate materials on the interface. For such condensation conditions the substrate itself is the main source of impurities in the film

  9. Substrate Frequency Effects on Cr x N Coatings Deposited by DC Magnetron Sputtering

    Science.gov (United States)

    Obrosov, Aleksei; Naveed, Muhammad; Volinsky, Alex A.; Weiß, Sabine

    2017-01-01

    Controlled ion bombardment is a popular method to fabricate desirable coating structures and modify their properties. Substrate biasing at high frequencies is a possible technique, which allows higher ion density at the substrate compared with DC current bias. Moreover, high ion energy along with controlled adatom mobility would lead to improved coating growth. This paper focuses on a similar type of study, where effects of coating growth and properties of DC magnetron-sputtered chromium nitride (Cr x N) coatings at various substrate bias frequencies are discussed. Cr x N coatings were deposited by pulsed DC magnetron sputtering on Inconel 718 and (100) silicon substrates at 110, 160 and 280 kHz frequency at low duty cycle. Coating microstructure and morphology were studied by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), scratch adhesion testing and nanoindentation. Results indicate a transformation of columnar into glassy structure of Cr x N coatings with the substrate bias frequency increase. This transformation is attributed to preferential formation of the Cr2N phase at high frequencies compared with CrN at low frequencies. Increase in frequency leads to an increase in deposition rate, which is believed to be due to increase in plasma ion density and energy of the incident adatoms. An increase in coating hardness along with decrease in elastic modulus was observed at high frequencies. Scratch tests show a slight increase in coating adhesion, whereas no clear increase in coating roughness can be found with the substrate bias frequency.

  10. 95. German Roentgen congress and 7. joint congress of the DRG and OeRG. Program with abstracts; 95. Deutscher Roentgenkongress und 7. Gemeinsamer Kongress von DRG und OeRG. Vollstaendiges Programm mit Abstracts

    Energy Technology Data Exchange (ETDEWEB)

    Diederich, Stefan; Lammer, Johannes (eds.)

    2014-05-15

    The volume contains the program and the abstracts of the 95th German Roentgen congress and the 7th joint congress of the DRG and OeRG. The radiological focal points of the congress were thorax radiology (pneumology: lung fibrosis, emphysema); oncological radiology: skeletal carcinoma, lung carcinoma, kidneys, lung metastases, primary liver carcinoma, liver metastases. Further topics included radiology in hospitals and medical centers, tele-radiology, ambulant health care, legal issues, financial accounting and management issues. Several courses an specific radiological issues and radiological techniques were offered, including radiation protection and legal aspects.

  11. Vortex trapping in Pb-alloy Josephson junctions induced by strong sputtering of the base electrode

    International Nuclear Information System (INIS)

    Wada, M.; Nakano, J.; Yanagawa, F.

    1985-01-01

    It is observed that strong rf sputtering of the Pb-alloy base electrodes causes the junctions to trap magnetic vortices and thus induces Josephson current (I/sub J/) suppression. Trapping begins to occur when the rf sputtering that removes the native thermal oxide on the base electrode is carried out prior to rf plasma oxidation. Observed large I/sub J/ suppression is presumably induced by the concentration of vortices into the sputtered area upon cooling the sample below the transition temperature. This suggests a new method of the circumvention of the vortex trapping by strongly rf sputtering the areas of the electrode other than the junction areas

  12. Sputtering in a glow discharge ion source - pressure dependence: theory and experiment

    International Nuclear Information System (INIS)

    Mason, R.S.; Pichilingi, Melanie

    1994-01-01

    A simplified theoretical expression has been developed for a glow discharge to show how the average cathode erosion rate (expressed as the number of atoms per ion of the total bombarding flux) varies with primary sputter yield, pressure, 'diffusion length' and sputtered atom 'stopping' cross section. An inverse pressure dependence is predicted which correlates well with experiment in the 2 and He, tend to converge. It is suggested that this could be due to a change in the mechanism to self-sputtering. Under constant conditions, the erosion rates of different cathode materials still correlate quite well with the differences in their primary sputter yields. (author)

  13. Angular distributions of particles sputtered from multicomponent targets with gas cluster ions

    Energy Technology Data Exchange (ETDEWEB)

    Ieshkin, A.E. [Faculty of Physics, Lomonosov Moscow State University, Leninskie Gory, Moscow 119991 (Russian Federation); Ermakov, Yu.A., E-mail: yuriermak@yandex.ru [Skobeltsyn Nuclear Physics Research Institute, Lomonosov Moscow State University, Leninskie Gory, Moscow 119991 (Russian Federation); Chernysh, V.S. [Faculty of Physics, Lomonosov Moscow State University, Leninskie Gory, Moscow 119991 (Russian Federation)

    2015-07-01

    The experimental angular distributions of atoms sputtered from polycrystalline W, Cd and Ni based alloys with 10 keV Ar cluster ions are presented. RBS was used to analyze a material deposited on a collector. It has been found that the mechanism of sputtering, connected with elastic properties of materials, has a significant influence on the angular distributions of sputtered components. The effect of non-stoichiometric sputtering at different emission angles has been found for the alloys under cluster ion bombardment. Substantial smoothing of the surface relief was observed for all targets irradiated with cluster ions.

  14. High-surface-quality nanocrystalline InN layers deposited on GaN templates by RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Valdueza-Felip, Sirona; Naranjo, Fernando B.; Gonzalez-Herraez, Miguel [Grupo de Ingenieria Fotonica, Departamento de Electronica, Escuela Politecnica Superior, Universidad de Alcala, Campus Universitario, 28871 Alcala de Henares, Madrid (Spain); Lahourcade, Lise; Monroy, Eva [Equipe mixte CEA-CNRS-UJF, Nanophysique et Semiconducteurs, INAC/SP2M/PSC, CEA-Grenoble, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Fernandez, Susana [Departamento de Energias Renovables, Energia Solar Fotovoltaica, Centro de Investigaciones Energeticas, Medioambientales y Tecnologicas (CIEMAT), Avda. Complutense 22, 28040 Madrid (Spain)

    2011-01-15

    We report a detailed study of the effect of deposition parameters on optical, structural, and morphological properties of InN films grown by reactive radio-frequency (RF) sputtering on GaN-on-sapphire templates in a pure nitrogen atmosphere. Deposition parameters under study are substrate temperature, RF power, and sputtering pressure. Wurtzite crystallographic structure with c-axis preferred growth orientation is confirmed by X-ray diffraction measurements. For the optimized deposition conditions, namely at a substrate temperature of 450 C and RF power of 30 W, InN films present a root-mean-square surface roughness as low as {proportional_to}0.4 nm, comparable to the underlying substrate. The apparent optical bandgap is estimated at 720 nm (1.7 eV) in all cases. However, the InN absorption band tail is strongly influenced by the sputtering pressure due to a change in the species of the plasma. (Copyright copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  15. Processing and performance of reactively sputtered titanium silicon nitride liners in copper metallization

    Science.gov (United States)

    Mirza, Jawid Majid

    Titanium silicon nitride (TiSiN) is a potential candidate for diffusion barrier applications in the advanced copper metallization schemes. This thesis focuses on the process development and optimization of reactively sputtered TiSiN films using statistically valid "design of experiment" (DOE) approach and testing the copper diffusion performance of TiSiN films. The design of experiment (DOE) approach showed that the nitrogen and DC target power had the most influence over the composition and resistivity of reactively sputtered TiSiN films. Thermal diffusion barrier performance of reactively sputtered TiSiN films against copper diffusion was tested as a function of the composition of reactively sputtered TiSiN films. Rutherford backscattering spectrometry (RBS) analysis of Cu (100 nm)/TiSiN (10 nm)/Si stacks annealed at 400°C temperatures indicated that TiSiN films deposited by physical vapor deposition (PVD) technique withstood this thermal treatment for 30 minutes. The situation was drastically changed when the Cu (100 nm)/TiSiN (10 nm)/Si film stacks were annealed at 500°C or higher temperatures for 30 minutes. All of the PVD TiSiN films tested (independent of their composition) showed copper diffusion through the barrier as detected by RBS. Secco etch method was used to confirm the findings of RBS studies. It was found that the PVD TiSiN films with at least 5--10 atomic percent of nitrogen acted as a good diffusion barrier against thermal diffusion of copper 400°C for 30 minutes anneal. However, 10 nm thick PVD TiSi film failed, even at a temperature 400°C for 30 minutes anneal. All of the PVD TiSiN films (independent of composition) annealed at 500°C or higher temperatures for 30 minutes, showed Secco etch pits in the silicon substrate. These etch pits indicate copper diffusion through the liner material. Thus nitrogen concentration of at least 5--10 atomic percent improved the barrier stability of reactively sputtered TiSiN films, as determined by Secco

  16. Titanium carbide coatings on molybdenum by means of reactive sputtering and electron beam techniques

    International Nuclear Information System (INIS)

    Obata, T.; Aida, H.; Hirohata, Y.; Mohri, M.; Yamashina, T.

    1982-01-01

    This study is an experimental investigation of TiC coatings on Mo substrate by means of a reactive r.f. sputtering in the presence of CH 4 and a chemical reaction with interdiffusion in the sandwich structure of Ti/C/Mo by electron beam evaporation and heating. Using the reactive sputtering method, a homogeneous TiC coating with stoichiometric composition and good adhesion could be produced in the conditions of the partial pressure range of CH 4 , 2 approx. equal to 5 x 10 -4 Torr (total pressure, Psub(Ar) + Psub(CH) 4 = 5.6 x 10 -2 Torr) at 300 0 C (substrate). By using the electron beams, successively evaporated carbon and Ti on a Mo substrate was heated to 700 0 C to form a TiC surface layer on the top which then remained stable during further heating to 1000 0 C. Godd adhesion was brought about by interdiffusion to produce Mo 2 C layer between TiC layer and Mo substrate. It was also found that further heating of the coating layers subsequent to Ti evaporation on the TiC layer produced thicker TiC layer due to a chemical reaction between Ti and inner carbon layers. This could be a promising method of in situ replenishment for TiC coatings on the first wall and the limiter materials. (orig.)

  17. Evaluation of target power supplies for krypton storage in sputter-deposited metals

    International Nuclear Information System (INIS)

    Greenwell, E.N.; McClanahan, E.D.; Moss, R.W.

    1986-04-01

    Implantation of 85 Kr in a growing sputtered metal deposit has been studied for the containment of 85 Kr recovered from the reprocessing of spent nuclear fuel. PNL, as part of DOE's research program for 85 Kr storage, has developed krypton trapping storage devices (KTSDs) in a range of sizes for ''cold'' and radioactive testing. The KTSD is a stainless steel canister that contains a sputtering target for depositing an amorphous rare-earth transition metal on the inner wall and simultaneously implanting low-energy krypton ions in the growing deposit. This report covers the design requirements for the target power supply and the description, testing and evaluation of three basic designs. The designs chosen for evaluation were: (1) a standard commercial power supply with an external PNL-designed current interrupter, (2) a commercially manufactured power supply with an integral series-type interrupter, and (3) a commercially manufactured power supply with an integral shunt-type interrupter. The units were compared on the basis of performance, reliability, and life-cycle cost. 8 refs., 9 figs., 2 tabs

  18. Low Temperature Reactive Sputtering of Thin Aluminum Nitride Films on Metallic Nanocomposites.

    Directory of Open Access Journals (Sweden)

    Khaled Sayed Elbadawi Ramadan

    Full Text Available Piezoelectric aluminum nitride thin films were deposited on aluminum-molybdenum (AlMo metallic nanocomposites using reactive DC sputtering at room temperature. The effect of sputtering parameters on film properties was assessed. A comparative study between AlN grown on AlMo and pure aluminum showed an equivalent (002 crystallographic texture. The piezoelectric coefficients were measured to be 0.5±0.1 C m(-2 and 0.9±0.1 C m(-2, for AlN deposited on Al/0.32Mo and pure Al, respectively. Films grown onto Al/0.32Mo however featured improved surface roughness. Roughness values were measured to be 1.3nm and 5.4 nm for AlN films grown on AlMo and on Al, respectively. In turn, the dielectric constant was measured to be 8.9±0.7 for AlN deposited on Al/0.32Mo seed layer, and 8.7±0.7 for AlN deposited on aluminum; thus, equivalent within experimental error. Compatibility of this room temperature process with the lift-off patterning of the deposited AlN is also reported.

  19. Low Temperature Reactive Sputtering of Thin Aluminum Nitride Films on Metallic Nanocomposites.

    Science.gov (United States)

    Ramadan, Khaled Sayed Elbadawi; Evoy, Stephane

    2015-01-01

    Piezoelectric aluminum nitride thin films were deposited on aluminum-molybdenum (AlMo) metallic nanocomposites using reactive DC sputtering at room temperature. The effect of sputtering parameters on film properties was assessed. A comparative study between AlN grown on AlMo and pure aluminum showed an equivalent (002) crystallographic texture. The piezoelectric coefficients were measured to be 0.5±0.1 C m(-2) and 0.9±0.1 C m(-2), for AlN deposited on Al/0.32Mo and pure Al, respectively. Films grown onto Al/0.32Mo however featured improved surface roughness. Roughness values were measured to be 1.3nm and 5.4 nm for AlN films grown on AlMo and on Al, respectively. In turn, the dielectric constant was measured to be 8.9±0.7 for AlN deposited on Al/0.32Mo seed layer, and 8.7±0.7 for AlN deposited on aluminum; thus, equivalent within experimental error. Compatibility of this room temperature process with the lift-off patterning of the deposited AlN is also reported.

  20. Ion beam sputtered aluminum based multilayer mirrors for extreme ultraviolet solar imaging

    Energy Technology Data Exchange (ETDEWEB)

    Ziani, A. [Laboratoire Charles Fabry, Institut d' Optique, CNRS, Univ Paris Sud, 2 Avenue Augustin Fresnel, 91127 Palaiseau cedex France (France); Centre National d’Etudes Spatiales (CNES), 18 Avenue E. Belin, 31401 Toulouse (France); Delmotte, F., E-mail: Franck.Delmotte@InstitutOptique.fr [Laboratoire Charles Fabry, Institut d' Optique, CNRS, Univ Paris Sud, 2 Avenue Augustin Fresnel, 91127 Palaiseau cedex France (France); Le Paven-Thivet, C. [Institut d' Electronique et de Télécommunications de Rennes (IETR) UMR-CNRS 6164, Université de Rennes 1, UEB, IUT Saint Brieuc, 18 rue Henri Wallon, 22004 Saint Brieuc cedex France (France); Meltchakov, E.; Jérome, A. [Laboratoire Charles Fabry, Institut d' Optique, CNRS, Univ Paris Sud, 2 Avenue Augustin Fresnel, 91127 Palaiseau cedex France (France); Roulliay, M. [Institut des Sciences Moléculaires d’Orsay UMR 8214, Univ Paris Sud, 91405 Orsay France (France); Bridou, F. [Laboratoire Charles Fabry, Institut d' Optique, CNRS, Univ Paris Sud, 2 Avenue Augustin Fresnel, 91127 Palaiseau cedex France (France); Gasc, K. [Centre National d’Etudes Spatiales (CNES), 18 Avenue E. Belin, 31401 Toulouse (France)

    2014-02-03

    In this paper, we report on the design, synthesis and characterization of extreme ultraviolet interferential mirrors for solar imaging applications in the spectral range 17 nm–34 nm. This research is carried out in the context of the preparation of the European Space Agency Solar Orbiter mission. The purpose of this study consists in optimizing the deposition of Al-based multilayers by ion beam sputtering according to several parameters such as the ion beam current and the sputtering angle. After optimization of Al thin films, several kinds of Al-based multilayer mirrors have been compared. We have deposited and characterized bi-material and also tri-material periodic multilayers: aluminum/molybdenum [Al/Mo], aluminum/molybdenum/boron carbide [Al/Mo/B{sub 4}C] and aluminum/molybdenum/silicon carbide [Al/Mo/SiC]. Best experimental results have been obtained on Al/Mo/SiC samples: we have measured reflectivity up to 48% at 17.3 nm and 27.5% at 28.2 nm on a synchrotron radiation source. - Highlights: • Design and synthesis of extreme ultraviolet interferential mirrors. • Optimization of aluminum thin films by adjusting several deposition parameters. • Comparison of results obtained with different types of Al-based multilayer mirrors. • Reflectivity up to 48% at 17.3 nm on a synchrotron radiation source.

  1. Ion beam sputtered aluminum based multilayer mirrors for extreme ultraviolet solar imaging

    International Nuclear Information System (INIS)

    Ziani, A.; Delmotte, F.; Le Paven-Thivet, C.; Meltchakov, E.; Jérome, A.; Roulliay, M.; Bridou, F.; Gasc, K.

    2014-01-01

    In this paper, we report on the design, synthesis and characterization of extreme ultraviolet interferential mirrors for solar imaging applications in the spectral range 17 nm–34 nm. This research is carried out in the context of the preparation of the European Space Agency Solar Orbiter mission. The purpose of this study consists in optimizing the deposition of Al-based multilayers by ion beam sputtering according to several parameters such as the ion beam current and the sputtering angle. After optimization of Al thin films, several kinds of Al-based multilayer mirrors have been compared. We have deposited and characterized bi-material and also tri-material periodic multilayers: aluminum/molybdenum [Al/Mo], aluminum/molybdenum/boron carbide [Al/Mo/B 4 C] and aluminum/molybdenum/silicon carbide [Al/Mo/SiC]. Best experimental results have been obtained on Al/Mo/SiC samples: we have measured reflectivity up to 48% at 17.3 nm and 27.5% at 28.2 nm on a synchrotron radiation source. - Highlights: • Design and synthesis of extreme ultraviolet interferential mirrors. • Optimization of aluminum thin films by adjusting several deposition parameters. • Comparison of results obtained with different types of Al-based multilayer mirrors. • Reflectivity up to 48% at 17.3 nm on a synchrotron radiation source

  2. Low refractive index SiOF thin films prepared by reactive magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Garcia-Garcia, F.J.; Gil-Rostra, J.; Terriza, A.; González, J.C.; Cotrino, J. [Instituto de Ciencia de Materiales de Sevilla, CSIC, Univ. Sevilla, Av. Américo Vespucio 49, E-41092 Sevilla (Spain); Frutos, F. [Departamento de Física Aplicada, E.T.S. Ingeniería Informática, University of Seville, Avd. Reina Mercedes s/n, E-41012 Seville (Spain); Ferrer, F.J. [Centro Nacional de Aceleradores, CSIC, Univ. Sevilla, Junta Andalucia, Thomas A. Edison 7, E-41092 Sevilla (Spain); González-Elipe, A.R. [Instituto de Ciencia de Materiales de Sevilla, CSIC, Univ. Sevilla, Av. Américo Vespucio 49, E-41092 Sevilla (Spain); Yubero, F., E-mail: yubero@icmse.csic.es [Instituto de Ciencia de Materiales de Sevilla, CSIC, Univ. Sevilla, Av. Américo Vespucio 49, E-41092 Sevilla (Spain)

    2013-09-02

    We have studied low refractive index fluorine doped silica thin films prepared by reactive magnetron sputtering. Two experimental parameters were varied to increase the porosity of the films, the geometry of the deposition process (i.e., the use of glancing angle deposition) and the presence of chemical etching agents (fluorine species) at the plasma discharge during film growth. The microstructure, chemistry, optical properties, and porosity of the films have been characterized by scanning electron and atomic force microscopy, Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, UV–vis, and spectroscopic ellipsometry. It is found that either the deposition at glancing angles or the incorporation of CF{sub x} species in the plasma discharge during film growth produces a decrease in the refractive index of the deposited films. The combined effect of the two experimental approaches further enhances the porosity of the films. Finally, the films prepared in a glancing geometry exhibit negative uniaxial birefringence. - Highlights: • SiOF thin films with controlled porosity prepared by reactive magnetron sputtering • Incorporation of CF{sub x} precursors in the plasma discharge enhances film porosity. • Deposition at glancing geometries further increases void fraction within the films.

  3. Deposition of (ZnO:In) TCO Thin Film on Glass Substrate Using DC Sputtering Technique

    International Nuclear Information System (INIS)

    Wirjoadi; Yunanto

    2009-01-01

    The (ZnO:In) TCO film has been deposited on glass structure using DC sputtering technique. The objective of this research is to study the effect of time deposition, gas pressure, substrate temperature, impurity of In on the resistance, transmittance, micro structure and crystal structure of (ZnO:In) thin film, so that it can be used as a CIS solar cell. The ZnO main target and In pinhole target was bombarded by Ar ion, so that the Zn, O, In atoms were sputtered and form thin film of (ZnO:In) on glass substrate. The resistance were measured using digital ohm meter, the transmittance using UV-Vis, micro structure and thickness using SEM and the crystal structure using XRD. The experiment results, show that the minimum resistance is 0.334 kΩ this obtained at the process parameter on 75 min of time deposition, 5x10 -2 Torr of gas pressure, 225℃ of substrate temperature and 8% of content In. The maximum transmittance is 80% at the wave length in (400-900) nm, while the crystal structure of ZnO and In thin film were oriented at the plane ( 0 0 4 ); ( 2 0 2 ) and ( 3 0 1 ). The surface morphology were distributed homogeneously with the thickness of the thin film was in order of 0.41 µm. (author)

  4. Microstructure and mechanical properties of Zr-Si-N films prepared by rf-reactive sputtering

    CERN Document Server

    Nose, M; Zhou, M; Mae, T; Meshii, M

    2002-01-01

    ZrN and ZrSiN films were prepared in an rf sputtering apparatus that has a pair of targets facing each other (referred to as the facing target--type rf sputtering). Films were deposited on silicon wafers without bias application or substrate heating in order to examine only the effect of silicon addition to the transition metal nitride films. The contents of zirconium, nitrogen, and silicon of the films were determined with an electron probe microanalyzer. The transmission electron microscopy studies were carried out in addition to x-ray diffraction. For the high resolution transmission electron microscopy observation, the field emission type transmission electron microscope was used, which provides a point-to-point resolution of 0.1 nm. The samples were observed both parallel and perpendicular to the film surface, which were plane and cross sectional views, respectively. In order to investigate the relationship between the mechanical properties and microstructure of films, the hardness was measured by a nano...

  5. Indium zinc oxide films deposited on PET by LF magnetron sputtering

    International Nuclear Information System (INIS)

    Kim, Eun Lyoung; Jung, Sang Kooun; Sohn, Sang Ho; Park, Duck Kyu

    2007-01-01

    Indium zinc oxide (IZO) has attracted much attention recently for use in transparent oxide films compared with the ITO film. We carried out the deposition of IZO on a polyethylene terapthalate (PET) substrate at room temperature by a low-frequency (LF) magnetron sputtering system. These films have amorphous structures with excellent electrical stability, surface uniformity and high optical transmittance. The effects of LF applied voltage and O 2 flow rate were investigated. The electrical and optical properties were studied. At optimal deposition conditions, thin films of IZO with a sheet resistance of 32 Ω/sq and an optical transmittance of over 80% in the visible spectrum range were achieved. The IZO thin films fabricated by this method do not require substrate heating during the film preparation of any additional post-deposition annealing treatment. The experimental results show that films with good qualities of surface morphology, transmittance and electrical conduction can be grown by the LF magnetron sputtering method on PET which is recommendable

  6. Graphene oxide on magnetron sputtered silver thin films for SERS and metamaterial applications

    Science.gov (United States)

    Politano, Grazia Giuseppina; Cazzanelli, Enzo; Versace, Carlo; Vena, Carlo; De Santo, Maria Penelope; Castriota, Marco; Ciuchi, Federica; Bartolino, Roberto

    2018-01-01

    In the last years the potential of combining the attractive materials characteristics of graphene related materials and silver nanostructures for SERS and metamaterials has emerged. Here, we report of graphene oxide thin films deposited by dip-coating on magnetron sputtered silver thin films. Our work represents a novelty in the field of the study of graphene oxide- silver composites, since magnetron sputtering deposition is an alternative way to silver thin films fabrication; previous works used instead silver nitrate aqueous solution mixed with the graphene oxide. Micro-Raman technique, morphological analysis and variable angle spectroscopic ellipsometry were performed. The final SERS signal intensity was investigated and we found Raman peaks dependent on the intensity of the laser and the thickness of silver and GO films. These results could open somestudies on plasmonics and on the reduction of graphene oxide mediated by silver thin films. Moreover, effective medium theory calculations show the possible use of these graphene oxide/silver thin films in multilayer hyperbolic metamaterials for optical applications.

  7. Optical and electron transport properties of reactively sputtered Cu/sub x/S

    International Nuclear Information System (INIS)

    Leong, J.Y.C.

    1980-01-01

    Thin films of Cu/sub x/S were deposited on glass slides by sputtering Cu in a reactive H 2 S/Ar environment. Optical transmittance and reflectance measurements were used to explore the infrared absorption spectra of the material. Analysis of the absorption edge characteristics resulted in the identification of an indirect bandgap at 1.15 (+-.05) eV, a direct bandgap at 1.30 (+-.05) eV, and an electron effective mass of 1.0 (+-0.2) m 0 . Electrical data consisting of resistivity and Hall effect measurements from liquid nitrogen to room temperature were analyzed to determine the dominant scattering mechanisms limiting the hole mobility in the material. Ionized impurity scattering was the dominant mechanism at low temperatures (T 0 K) and polar optical phonon scattering was most effective at high temperatures (T > 150 0 K). All films were p-type. Effects of sputtering gas pressure, heat treatments, and temperature on the properties were studied

  8. High-power DPL thin films prepared by ion beam sputtering

    Science.gov (United States)

    Liu, Hongxiang; Xiong, Shengming; Zhang, Yundong

    2006-08-01

    Ion beam sputtering enables high laser damage threshold mirrors to be manufactured. Oxygen partial pressure was found to have significant influence on the microstructure and optical properties of HfO II thin films deposited by ion beam sputtering (IBS). Atomic force microscopy studies have shown that the surface of single HfO II films is clearly characterized by deep holes. When oxygen is excessive, the RMS roughness of the surface increases with the presence of the holes, and the transmittance of the single HfO II layers reduces evidently in the shortwave spectral region. The laser-induced damage threshold (LIDT) of HfO II/SiO II multilayer stacks was investigated with a diode pump laser at 1064 nm under a certain repetition frequency. The laser-induced damage morphology of DPL thin films were observed by the optical microscope. SiO II overcoats increase the damage threshold and modify the damage morphology of IBS coatings. The LIDT of the cavity mirrors is > 1 GW/cm2 at 1064 nm (80 ns, 10 KHz).

  9. Coatings manufactured using magnetron sputtering technology to protect against infrared radiation for use in firefighter helmets

    Directory of Open Access Journals (Sweden)

    Fejdyś Marzena

    2016-09-01

    Full Text Available The aim of this study was to test the usefulness of magnetron sputtering technology to produce coatings on selected elements of a firefighter’s helmet to protect against infrared radiation (PN-EN 171 standard. The scope of research includes testing the deposition produced via magnetron sputtering of metallic and ceramic coatings on plastics, which are used to manufacture the components comprising the personal protection equipment used by firefighters. The UV-VIS, NIR used to research the permeation coefficients and reflections for light and infrared light and the emission spectrometry with ICP-AES used for the quantitative analysis of elements in metallic and ceramic coatings. Microstructural and micro-analytical testing of the coatings were performed using scanning electron microscopy (SEM. Measurements of the chemical compositions were conducted using energy-dispersive X-ray spectroscopy (EDS. The hardnesss of the coatings were tested using a indentation method, and the coating thicknesses were tested using a ellipsometry method.

  10. Open evaluation (OE: A vision for entirely transparent post-publication peer review and rating for science

    Directory of Open Access Journals (Sweden)

    Nikolaus eKriegeskorte

    2012-10-01

    Full Text Available The two major functions of a scientific publishing system are to provide access to and evaluation of scientific papers. While open access (OA is becoming a reality, open evaluation (OE, the other side of coin, has received less attention. Evaluation steers the attention of the scientific community and thus the very course of science. It also influences the use of scientific findings in public policy. The current system of scientific publishing provides only journal prestige as an indication of the quality of new papers and relies on a non-transparent and noisy pre-publication peer review process, which delays publication by many months on average. Here I propose an OE system, in which papers are evaluated post-publication in an ongoing fashion by means of open peer review and rating. Through signed ratings and reviews, scientists steer the attention of their field and build their reputation. Reviewers are motivated to be objective, because low-quality or self-serving signed evaluations will negatively impact their reputation. A core feature of this proposal is a division of powers between the accumulation of evaluative evidence and the analysis of this evidence by paper evaluation functions (PEFs. PEFs can be freely defined by individuals or groups (e.g. scientific societies and provide a plurality of perspectives on the scientific literature. Simple PEFs will use averages of ratings, weighting reviewers (e.g. by H-factor and rating scales (e.g. by relevance to a decision process in different ways. Complex PEFs will use advanced statistical techniques to infer the quality of a paper. Papers with initially promising ratings will be more deeply evaluated. The continual refinement of PEFs in response to attempts by individuals to influence evaluations in their own favor will make the system ungameable. OA and OE together have the power to revolutionize scientific publishing and usher in a new culture of transparency, constructive criticism, and

  11. Large negative magnetoresistance in reactive sputtered polycrystalline GdNx films

    KAUST Repository

    Mi, W. B.

    2013-06-07

    Polycrystalline ferromagnetic GdN x films were fabricated at different N2 flow rates ( fN2 ) to modify N-vacancy concentration so as to study its influence on electrotransport. Metal-semiconductor transition appears at Curie temperature (TC ) of ∼40 K. Temperature-dependent magnetoresistance (MR) shows a peak at T C. The films at fN2  = 5, 10, 15, and 20 sccm show MR of −38%, −42%, −46%, and −86% at 5 K and 50 kOe, respectively. Above 15 K, MR is from colossal MR and from both colossal and tunneling MR below 15 K. The enhanced MR at fN2  = 20 sccm is attributed to large spin polarization of half-metallicity in GdN x with low N vacancies.

  12. Fabrication of Nb2O5/SiO2 mixed oxides by reactive magnetron co-sputtering

    International Nuclear Information System (INIS)

    Juškevičius, Kęstutis; Audronis, Martynas; Subačius, Andrius; Kičas, Simonas; Tolenis, Tomas; Buzelis, Rytis; Drazdys, Ramutis; Gaspariūnas, Mindaugas; Kovalevskij, Vitalij; Matthews, Allan; Leyland, Adrian

    2015-01-01

    This paper investigates niobia/silica mixed oxide thin films deposited by reactive pulse-DC/RF magnetron co-sputtering of Nb and Si metal targets at room temperature. The reactive gas flow during the sputtering processes was either controlled by direct mass flow rate (i.e. constant reactive gas flow) or by an active feedback process control system. 61% and 137% higher deposition rates of Nb 2 O 5 and SiO 2 layers, respectively, were obtained using the latter technique as compared to constant reactive gas flow. Films exhibited bulk or near-bulk density. All mixture films produced in this study had an amorphous structure. A volume law of mixtures was used to determine the coating composition. It is shown that the fraction of SiO 2 or/and Nb 2 O 5 has a linear dependency on sputter target power density. On this basis, rugate filter coating designs can be easily deposited, where refractive index gradually varies between that of pure Nb 2 O 5 and pure SiO 2 . Substantially less inhomogeneity of coating mixtures was found in films produced using a reactive sputtering process with feedback-control. - Highlights: • 61% and 137% increase in deposition rates of Nb 2 O 5 and SiO 2 • Rugate coating designs can be readily deposited. • Nb 2 O 5 /SiO 2 mixture films exhibited bulk or near-bulk density. • Optimized process leads to stoichiometric and homogenous mixtures. • Films are amorphous and suitable for low loss optical coatings

  13. The influence of sputter deposition parameters on piezoelectric and mechanical properties of AlN thin films

    International Nuclear Information System (INIS)

    Ababneh, A.; Schmid, U.; Hernando, J.; Sanchez-Rojas, J.L.; Seidel, H.

    2010-01-01

    Aluminium nitride (AlN) reactively sputter-deposited from an aluminium target is an interesting piezoelectric thin film material with high CMOS compatibility. A good c-axis orientation is essential for obtaining high piezoelectric coefficients. Therefore, the influence of different sputtering conditions on the microstructure of AlN thin films with a typical thickness of about 500 nm was investigated. In this study it is demonstrated that highly c-axis oriented AlN thin films can be deposited on nominally unheated (1 0 0) silicon substrates, most preferentially when using a pure nitrogen atmosphere. The degree of c-axis orientation increases with higher nitrogen concentration and with decreasing the sputtering pressure, whereas the influence of plasma power on the microstructure was found to be negligible. A low sputtering pressure is also useful for minimizing the amount of oxygen contaminations in the deposition chamber and hence for reducing the incorporation of impurities into the AlN films. Intrinsic stress values of AlN thin films were determined by wafer bow measurements and were found to be between -3.5 and 750 MPa depending on choice of deposition parameters. Finally, the piezoelectric coefficients d 33 and d 31 were determined experimentally by laser scanning vibrometry in conjunction with a theoretical model. Effective values in c-axis oriented 500 nm films with FWHM of 0.33 deg. are 3.0 and -1.0 pm/V. For a film of 2.4 μm thickness, values of 5.0 and -1.8 pm/V were measured, which are near the bulk values.

  14. Experimental evidence of spin glass and exchange bias behavior in sputtered grown α-MnO{sub 2} nanorods

    Energy Technology Data Exchange (ETDEWEB)

    Kumar, Ashwani; Sanger, Amit; Singh, Amit Kumar; Kumar, Arvind [Nanoscience Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Kumar, Mohit [Department of Condensed Matter Physics, Weizmann Institute of Science, Rehovot 76100 (Israel); Chandra, Ramesh [Nanoscience Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India)

    2017-07-01

    Highlights: • We have synthesized the α-MnO{sub 2} nanorods by using DC reactive sputtering. • We observed Spin glass and exchange bias behavior at low temperature in sputtered grown α-MnO{sub 2} nanorods. • Exchange bias arises due to exchange coupling of uncompensated FM spins and AFM spins at FM/AFM interface. - Abstract: Here, we present a single-step process to synthesize the α-MnO{sub 2} nanorods forest using reactive DC magnetron sputtering for the application of magnetic memories. The structural and morphological properties of the α-MnO{sub 2} nanorods were systematically studied using numerous analytical techniques, including X-ray diffraction, Raman spectroscopy, field-emission scanning electron microscopy and transmission electron microscopy. The magnetic measurements suggest that the α-MnO{sub 2} nanorods exhibit spin glass and exchange bias behaviour at low temperature. Such low temperature behaviour is explained by the core-shell type structure of nanorods. Antiferromagnetic core and shell of uncompensated ferromagnetic spins leads to the formation of antiferromagnetic/ferromagnetic (AFM/FM) interfaces, which originates exchange bias in the sample.

  15. Deposition and characterization of titania-silica optical multilayers by asymmetric bipolar pulsed dc sputtering of oxide targets

    International Nuclear Information System (INIS)

    Sagdeo, P R; Shinde, D D; Misal, J S; Kamble, N M; Tokas, R B; Biswas, A; Poswal, A K; Thakur, S; Bhattacharyya, D; Sahoo, N K; Sabharwal, S C

    2010-01-01

    Titania-silica (TiO 2 /SiO 2 ) optical multilayer structures have been conventionally deposited by reactive sputtering of metallic targets. In order to overcome the problems of arcing, target poisoning and low deposition rates encountered there, the application of oxide targets was investigated in this work with asymmetric bipolar pulsed dc magnetron sputtering. In order to evaluate the usefulness of this deposition methodology, an electric field optimized Fabry Perot mirror for He-Cd laser (λ = 441.6 nm) spectroscopy was deposited and characterized. For comparison, this mirror was also deposited by the reactive electron beam (EB) evaporation technique. The mirrors developed by the two complementary techniques were investigated for their microstructural and optical reflection properties invoking atomic force microscopy, ellipsometry, grazing incidence reflectometry and spectrophotometry. From these measurements the layer geometry, optical constants, mass density, topography, surface and interface roughness and disorder parameters were evaluated. The microstructural properties and spectral functional characteristics of the pulsed dc sputtered multilayer mirror were found to be distinctively superior to the EB deposited mirror. The knowledge gathered during this study has been utilized to develop a 21-layer high-pass edge filter for radio photoluminescence dosimetry.

  16. Design and capabilities of an experimental setup based on magnetron sputtering for formation and deposition of size-selected metal clusters on ultra-clean surfaces

    DEFF Research Database (Denmark)

    Hartmann, Hannes; Popok, Vladimir; Barke, Ingo

    2012-01-01

    The design and performance of an experimental setup utilizing a magnetron sputtering source for production of beams of ionized size-selected clusters for deposition in ultra-high vacuum is described. For the case of copper cluster formation the influence of different source parameters is studied...

  17. Effect of process parameters on mechanical and tribological performance of pulsed-DC sputtered TiC/a-C : H nanocomposite films

    NARCIS (Netherlands)

    Shaha, K.P.; Pei, Y.T.; Martinez-Martinez, D.; Sanchez-Lopez, J.C.; Hosson, J.Th.M. De

    2010-01-01

    Mechanical, structural, chemical bonding (sp(3)/sp(2)). and tribological properties of films deposited by pulsed-DC sputtering of Ti targets in Ar/C2H2 plasma were studied as a function of the substrate bias voltage, Ti-target current, C2H2 flow rate and pulse frequency by nanoindentation, Raman

  18. Avaliação de ICP OES com configuração axial ou radial para determinação de iodo em sal de cozinha

    Directory of Open Access Journals (Sweden)

    Adriana A. Oliveira

    2012-01-01

    Full Text Available The performance of inductively-coupled plasma optical emission spectrometers with axial and radial views for determination of iodine in table salt was evaluated. Interference and memory effects in nitric acid and water-soluble tertiary amines (CFA-C media were studied. Based on a factorial experiment, one optimum instrument operational condition for axial configuration, and two optima conditions for radial configuration was established. The ICP OES with axial view was 5-fold more sensitive than the radial view. Both matrix matching and standard addition methods were used for iodine quantification and for most samples, both strategies of calibration led to similar results. Recoveries ranged from 104 to 114%.

  19. Pd-catalysts for DFAFC prepared by magnetron sputtering

    Czech Academy of Sciences Publication Activity Database

    Bieloshapka, Igor; Jiříček, Petr; Vorokhta, M.; Tomšík, Elena; Rednyk, A.; Perekrestov, R.; Jurek, Karel; Ukraintsev, Egor; Hruška, Karel; Romanyuk, Olexandr; Lesiak, B.

    2017-01-01

    Roč. 419, Oct (2017), s. 838-846 ISSN 0169-4332 R&D Projects: GA ČR(CZ) GBP108/12/G108; GA MŠk LM2015088 Institutional support: RVO:68378271 ; RVO:61389013 Keywords : Pd catalyst * formic acid fuel cell * magnetron sputtering * DFAFC * surface morphology Subject RIV: BM - Solid Matter Physics ; Magnetism; BM - Solid Matter Physics ; Magnetism (UMCH-V) OBOR OECD: Condensed matter physics (including formerly solid state physics, supercond.); Condensed matter physics (including formerly solid state physics, supercond.) (UMCH-V) Impact factor: 3.387, year: 2016

  20. Carbon dust formation in a cold plasma from cathode sputtering

    International Nuclear Information System (INIS)

    Arnas, C.; Mouberi, A.; Hassouni, K.; Michau, A.; Lombardi, G.; Bonnin, X.; Benedic, F.; Pegourie, B.

    2009-01-01

    Nanoparticles are produced in argon glow plasmas where carbon is introduced by sputtering of a graphite cathode. A scaling law of growth is reported on as a function of the discharge time. Two successive stages of growth of concomitant agglomeration and carbon deposition are observed, followed by a final stage of growth by carbon deposition. A model of formation of molecular precursors by coagulation of neutral clusters on the one hand and of neutral-negative clusters on the other hand is presented, based on formation enthalpy and cluster geometry.