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Sample records for rf-sputtering tonkie plenki

  1. RF sputtering: A viable tool for MEMS fabrication

    Indian Academy of Sciences (India)

    being prepared by RF sputtering and their application in MEMS being explored. ... crystallographic properties were evaluated using XRD analysis (CuKα radiation ..... Bhatt V, Pal P, Chandra S 2005 Feasibility study of RF sputtered ZnO film for ...

  2. Influence of R.F. sputter parameters on the magnetic orientation of Co-Cr layers

    NARCIS (Netherlands)

    Lodder, J.C.; Wielinga, T.

    1984-01-01

    Co-Cr layers for the perpendicular recording mode were deposited by means of RF-sputtering. The most important sputter parameters, i.e. the RF sputter high voltage VRF, the argon pressure Par and the substrate holder temperature Tsh, gave an optimum value for perpendicular orientation of the

  3. Metastable bcc Fe-Mn alloys produced by rf sputtering

    International Nuclear Information System (INIS)

    Sumiyama, Kenji; Kadono, Masaru; Nakamura, Yoji

    1981-01-01

    Fe sub(1-x)Mn sub(x) alloy films obtained by rf sputtering technique have been investigated by X-ray diffraction, magnetization and Moessbauer effect measurements. The single bcc phase extends up to about x = 0.2, while a bcc-fcc mixed phase appears for x = 0.2 - 0.26. The lattice constants of the bcc phase are about 0.5% larger than those of the bulk specimens. The magnetization decreases monotonically with increasing x in the bcc phase, while it decreases sharply in the bcc-fcc mixed phase. These results are consistent with the Moessbauer spectra of these alloy films. The volume fraction of bcc and fcc phases has been estimated from Moessbauer analyses as well as magnetization measurements. (author)

  4. Growth and characterization of high quality ZnS thin films by RF sputtering

    Science.gov (United States)

    Mukherjee, C.; Rajiv, K.; Gupta, P.; Sinha, A. K.; Abhinandan, L.

    2012-06-01

    High optical quality ZnS films are deposited on glass and Si wafer by RF sputtering from pure ZnS target. Optical transmittance, reflectance, ellipsometry, FTIR and AFM measurements are carried out. Effect of substrate temperature and chamber baking for long duration on film properties have been studied. Roughness of the films as measured by AFM are low (1-2Å).

  5. Superhydrophobic and icephobic surfaces prepared by RF-sputtered polytetrafluoroethylene coatings

    Energy Technology Data Exchange (ETDEWEB)

    Jafari, R., E-mail: rjafari@uqac.ca [NSERC / Hydro-Quebec / UQAC Industrial Chair on Atmospheric Icing of Power Network Equipment (CIGELE) and Canada Research Chair on Engineering of Power Network Atmospheric Icing (INGIVRE), Universite du Quebec a Chicoutimi, Chicoutimi, QC (Canada); Menini, R.; Farzaneh, M. [NSERC / Hydro-Quebec / UQAC Industrial Chair on Atmospheric Icing of Power Network Equipment (CIGELE) and Canada Research Chair on Engineering of Power Network Atmospheric Icing (INGIVRE), Universite du Quebec a Chicoutimi, Chicoutimi, QC (Canada)

    2010-12-15

    A superhydrophobic and icephobic surface were investigated on aluminum alloy substrate. Anodizing was used first to create a micro-nanostructured aluminum oxide underlayer on the alloy substrate. In a second step, the rough surface was coated with RF-sputtered polytetrafluoroethylene (PTFE or Teflon). Scanning electron microscopy images showed a 'bird's nest'-like structure on the anodized surface. The RF-sputtered PTFE coating exhibited a high static contact angle of {approx}165 deg. with a very low contact angle hysteresis of {approx}3 deg. X-ray photoelectron spectroscopy (XPS) results showed high quantities of CF{sub 3} and CF{sub 2} groups, which are responsible for the hydrophobic behavior of the coatings. The performance of this superhydrophobic film was studied under atmospheric icing conditions. These results showed that on superhydrophobic surfaces ice-adhesion strength was 3.5 times lower than on the polished aluminum substrate.

  6. Superhydrophobic and icephobic surfaces prepared by RF-sputtered polytetrafluoroethylene coatings

    International Nuclear Information System (INIS)

    Jafari, R.; Menini, R.; Farzaneh, M.

    2010-01-01

    A superhydrophobic and icephobic surface were investigated on aluminum alloy substrate. Anodizing was used first to create a micro-nanostructured aluminum oxide underlayer on the alloy substrate. In a second step, the rough surface was coated with RF-sputtered polytetrafluoroethylene (PTFE or Teflon). Scanning electron microscopy images showed a 'bird's nest'-like structure on the anodized surface. The RF-sputtered PTFE coating exhibited a high static contact angle of ∼165 deg. with a very low contact angle hysteresis of ∼3 deg. X-ray photoelectron spectroscopy (XPS) results showed high quantities of CF 3 and CF 2 groups, which are responsible for the hydrophobic behavior of the coatings. The performance of this superhydrophobic film was studied under atmospheric icing conditions. These results showed that on superhydrophobic surfaces ice-adhesion strength was 3.5 times lower than on the polished aluminum substrate.

  7. Superhydrophobic and icephobic surfaces prepared by RF-sputtered polytetrafluoroethylene coatings

    Science.gov (United States)

    Jafari, R.; Menini, R.; Farzaneh, M.

    2010-12-01

    A superhydrophobic and icephobic surface were investigated on aluminum alloy substrate. Anodizing was used first to create a micro-nanostructured aluminum oxide underlayer on the alloy substrate. In a second step, the rough surface was coated with RF-sputtered polytetrafluoroethylene (PTFE or Teflon ®). Scanning electron microscopy images showed a " bird's nest"-like structure on the anodized surface. The RF-sputtered PTFE coating exhibited a high static contact angle of ˜165° with a very low contact angle hysteresis of ˜3°. X-ray photoelectron spectroscopy (XPS) results showed high quantities of CF 3 and CF 2 groups, which are responsible for the hydrophobic behavior of the coatings. The performance of this superhydrophobic film was studied under atmospheric icing conditions. These results showed that on superhydrophobic surfaces ice-adhesion strength was 3.5 times lower than on the polished aluminum substrate.

  8. Influence of the Preparation Method, DC and RF Sputtering, on theProperties of Thin Film

    International Nuclear Information System (INIS)

    Tri-Mardji-Atmono; Widdi-Usada; Agus-Purwadi; Yunanto; Edi-Suharyadi

    2000-01-01

    The research on the influence of preparation method DC- and RF Sputteringon the properties of Fe-thin films has been done. The measurement with EDAXshows. that the Fe-content of RF-sputtered film increased with the increasingof self-bias voltage in the range of 850 - 1000 V. The observation ofmicrostructure using SEM shows a more homogeneity of thin film and smallergrain size with the increasing of the self-bias voltage. On the other hand,thin films with inhomogeneity of the structure were produced by DC-Sputteringprocess, indicated by the non continuity and the spread of theglow-discharge. Based on the investigation with X-ray diffraction, thin filmprepared by RF-Sputtering was amorphous, while the film produced by theDC-Sputtering is known as crystal structure. Preparation using DC-voltageshows continual sputtering-process at the voltage of 3000 V betweenelectrode. (author)

  9. Fabrication and properties of yttrium doped barium titanate film by RF sputtering

    International Nuclear Information System (INIS)

    Igarashi, H.; Yuasa, M.; Okazaki, K.

    1985-01-01

    Semiconductive barium titanate films were fabricated by RF sputtering on fused quartz, alumina and barium titanate ceramic substrates using barium titanate ceramic with a small amount of yttria as a target. The films on the barium titanate substrates turned blue color and showed a small PTC effect by heat-treating at 1000 0 C in the air after deposition at the substrate temperature of 600 0 C

  10. Thin films preparation of the Ti-Al-O system by rf-sputtering;Preparacion de peliculas delgadas del sistema Ti-Al-O mediante rf-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Montes de Oca, J. A.; Ceballos A, J.; Galaviz P, J. [IPN, Centro de Investigacion en Ciencia Aplicada y Tecnologia Avanzada, Unidad Altamira, Km 14.5 Carretera Tampico-Puerto Industrial Altamira, 89600 Altamira, Tamaulipas (Mexico); Manaud, J. P.; Lahaye, M. [Centre National de la Recherche Scientifique, Institut de Chimie de la Matiere Condensee, Universite Bordeaux I, 87, Av. du Dr. Schweitzer, F-33608 Pessac-Cedex (France); Munoz S, J., E-mail: jmontedeocacv@ipn.m [IPN, Centro de Investigacion y de Estudios Avanzados, Unidad Queretaro, Libramiento Norponiente No. 2000, Fracc. Real de Juriquilla, 76230 Santiago de Queretaro, Qro. (Mexico)

    2010-07-01

    In the present work Ti-Al-O thin films were synthesized by rf-sputtering technique on glass and silicon (Si) substrates using Ti Al and Ti{sub 3}Al targets in a sputtering chamber with an Ar-O{sub 2} atmosphere. Ti-Al-O thin films were obtained varying experimental parameters such as oxygen percent fed to the reaction chamber, plasma power density and substrate temperature. The films deposited on glass substrates were used to evaluate their optical properties, while those deposited on Si substrates were used to evaluate mechanical and morphological properties. The crystalline structure, morphology, chemical composition and optical properties of the films were evaluated by X-ray diffraction, high-resolution scanning electron microscopy, Auger electron microscopy and visible UV spectroscopy. Films thicknesses were measured using a profiler. The roughness and mechanical properties such as hardness and Young modulus were analyzed by atomic force microscopy and nano indentation technique, respectively. (Author)

  11. Plasma polymer films rf sputtered from PTFE under various argon pressures

    Czech Academy of Sciences Publication Activity Database

    Stelmashuk, Vitaliy; Biederman, H.; Slavinská, D.; Zemek, Josef; Trchová, Miroslava

    2005-01-01

    Roč. 77, č. 2 (2005), s. 131-137 ISSN 0042-207X R&D Projects: GA MŠk(CZ) OC 527.10; GA MŠk(CZ) OC 527.90 Grant - others:EUREKAΣ2080(XE) OE57 Institutional research plan: CEZ:AV0Z10100521; CEZ:AV0Z20430508 Keywords : RF sputtering * PTFE * fluorcarbon plasma polymers * thin film * teflon * deposition Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 0.909, year: 2005

  12. Some magnetic and magnetoresistive properties of RF-sputtered thin NiFe-Si films.

    Science.gov (United States)

    Vatskicheva, M.; Vatskichev, Ly.; Dimitrov, I.; Kunev, B.

    The galvanomagnetic properties and some structural peculiarities of rf-sputtered alloy films (NI80Fe20)100-xSix at 0 < x < 30 at. % were studied and compared with the corresponding properties of evaporated films of the same thickness and composition. The content of silicon increased with the increasing of the velocity of deposition and led to the amorphousation of the films. Coercivity decreased with the velocity of growth but it did not depend on the thickness and on the velocity of film deposition. The magnetoresistance ratio Dr/r of the sputtered films was about three times higher then that of the evaporated films.

  13. Dispersive transport in hydrogenated a-Si prepared by rf sputtering

    International Nuclear Information System (INIS)

    Shirafuji, Junji; Kim, Gi-Il; Sawadsaringkarn, M.; Inuishi, Yoshio

    1981-01-01

    Time-of-flight measurement of photo-excited carriers has been carried out in hydrogenated a-Si deposited by rf sputtering method. Both electrons and holes show highly dispersive transport. The electron drift mobility near room temperature ranges from 5 x 10 -3 to 4 x 10 -5 cm 2 /V.s, much lower than that of GD samples, and the activation energy is about 0.3 eV. The value of the hole mobility is comparable with that in GD specimens, but its activation energy is about 0.2 eV which is about half of that observed in GD a-Si. (author)

  14. Optical, electrical, structural and microstructural characteristics of rf sputtered ITO films developed for art protection coatings

    International Nuclear Information System (INIS)

    Krasilnikova Sytchkova, A.; Grilli, M.L.; Piegari, A.; Boycheva, S.

    2007-01-01

    Transparent and conductive tin-doped indium oxide (ITO) films have been prepared by rf sputtering in an Ar and Ar+O 2 gas mixture, both with and without additional substrate heating. The influence of both deposition conditions and post-annealing treatment on optical, electrical, structural and microstructural properties of the ITO films has been investigated. The optical constants have been calculated in the range 320-2500 nm using a combination of several theoretical models. A schematic diagram for the film properties change versus composition has been proposed in terms of a generalized parameter characterising the energy efficiency of the film formation. The deposition conditions and the optical and electrical properties of the films have been optimized with respect to the requirements for their application in art protection coatings. (orig.)

  15. Optical emission spectroscopy during fabrication of indium-tin-oxynitride films by RF-sputtering

    International Nuclear Information System (INIS)

    Koufaki, M.; Sifakis, M.; Iliopoulos, E.; Pelekanos, N.; Modreanu, M.; Cimalla, V.; Ecke, G.; Aperathitis, E.

    2006-01-01

    Indium-tin-oxide (ITO) and indium-tin-oxynitride (ITON) films have been deposited on glass by rf-sputtering from an ITO target, using Ar plasma and N 2 plasma, respectively, and different rf-power. Optical emission spectroscopy (OES) was employed to identify the species present in the plasma and to correlate them with the properties of the ITO and ITON thin films. Emission lines of ionic In could only be detected in N 2 plasma, whereas in the Ar plasma additional lines corresponding to atomic In and InO, were detected. The deposition rate of thin films was correlated with the In species, rather than the nitrogen species, emission intensity in the plasma. The higher resistivity and lower carrier concentration of the ITON films, as compared to the respective properties of the ITO films, were attributed to the incorporation of nitrogen, instead of oxygen, in the ITON structure

  16. Thin films preparation of the Ti-Al-O system by rf-sputtering

    International Nuclear Information System (INIS)

    Montes de Oca, J. A.; Ceballos A, J.; Galaviz P, J.; Manaud, J. P.; Lahaye, M.; Munoz S, J.

    2010-01-01

    In the present work Ti-Al-O thin films were synthesized by rf-sputtering technique on glass and silicon (Si) substrates using Ti Al and Ti 3 Al targets in a sputtering chamber with an Ar-O 2 atmosphere. Ti-Al-O thin films were obtained varying experimental parameters such as oxygen percent fed to the reaction chamber, plasma power density and substrate temperature. The films deposited on glass substrates were used to evaluate their optical properties, while those deposited on Si substrates were used to evaluate mechanical and morphological properties. The crystalline structure, morphology, chemical composition and optical properties of the films were evaluated by X-ray diffraction, high-resolution scanning electron microscopy, Auger electron microscopy and visible UV spectroscopy. Films thicknesses were measured using a profiler. The roughness and mechanical properties such as hardness and Young modulus were analyzed by atomic force microscopy and nano indentation technique, respectively. (Author)

  17. RF sputtered HgCdTe films for tandem cell applications

    International Nuclear Information System (INIS)

    Wang, S.L.; Lee, S.H.; Gupta, A.; Compaan, A.D.

    2004-01-01

    Polycrystalline Hg 1-x Cd x Te films were investigated for their potential as bottom cells of a CdTe-based tandem solar cell. The films were deposited by RF sputtering from a cold pressed target containing 30% HgTe+70% CdTe. The as-deposited films were highly resistive with (111) preferred orientation and a bandgap of ∝1.0 eV. Various thermal treatment schemes were investigated under different conditions of ambient and temperature to reduce the resistivity. The film properties were analyzed using infrared transmission spectra, energy dispersive X-ray spectra and X-ray diffraction. N doped p-HgCdTe films were also prepared by reactive sputtering in a N 2 /Ar ambient. P-n junction solar cells were fabricated with CdS films as the heterojunction partner. (copyright 2004 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  18. Cholesterol biosensor based on rf sputtered zinc oxide nanoporous thin film

    International Nuclear Information System (INIS)

    Singh, S. P.; Arya, Sunil K.; Pandey, Pratibha; Malhotra, B. D.; Saha, Shibu; Sreenivas, K.; Gupta, Vinay

    2007-01-01

    Cholesterol oxidase (ChOx) has been immobilized onto zinc oxide (ZnO) nanoporous thin films grown on gold surface. A preferred c-axis oriented ZnO thin film with porous surface morphology has been fabricated by rf sputtering under high pressure. Optical studies and cyclic voltammetric measurements show that the ChOx/ZnO/Au bioelectrode is sensitive to the detection of cholesterol in 25-400 mg/dl range. A relatively low value of enzyme's kinetic parameter (Michaelis-Menten constant) ∼2.1 mM indicates enhanced enzyme affinity of ChOx to cholesterol. The observed results show promising application of nanoporous ZnO thin film for biosensing application without any functionalization

  19. Electrical insulation properties of RF-sputtered LiPON layers towards electrochemical stability of lithium batteries

    OpenAIRE

    Vieira, E. M. F.; Ribeiro, J. F.; Silva, Maria Manuela; Barradas, N. P.; Alves, E.; Alves, A.; Correia, M. R.; Gonçalves, L. M.

    2016-01-01

    Electrochemical stability, moderate ionic conductivity and low electronic conductivity make the lithium phosphorous oxynitride (LiPON) electrolyte suitable for micro and nanoscale lithium batteries. The electrical and electrochemical properties of thin-film electrolytes can seriously compromise full battery performance. Here, radio-frequency (RF)-sputtered LiPON thin films were fabricated in nitrogen plasma under different working pressure conditions. With a slight decrease in ...

  20. Indium tin oxide thin films by bias magnetron rf sputtering for heterojunction solar cells application

    International Nuclear Information System (INIS)

    Zhao Liang; Zhou Zhibin; Peng Hua; Cui Rongqiang

    2005-01-01

    In this investigation ITO thin films were prepared by bias magnetron rf sputtering technique at substrate temperature of 180 deg. C and low substrate-target distance for future a-Si:H/c-Si heterojunction (HJ) solar cells application. Microstructure, surface morphology, electrical and optical properties of these films were characterized and analyzed. The effects of ion bombardments on growing ITO films are well discussed. XRD analysis revealed a change in preferential orientation of polycrystalline structure from (2 2 2) to (4 0 0) plane with the increase of negative bias voltage. Textured surface were observed on AFM graphs of samples prepared at high negative bias. Hall measurements showed that the carrier density and Hall mobility of these ITO films are sensitive to the bias voltage applied. We attributed these effects to the sensitivity of energy of Ar + ions bombarding on growing films to the applied bias voltage in our experiments. At last the figure of merit was calculated to evaluate the quality of ITO thin films, the results of which show that sample prepared at bias voltage of -75 V is good to be used in HJ cells application

  1. Annealing Temperature Dependent Structural and Optical Properties of RF Sputtered ZnO Thin Films.

    Science.gov (United States)

    Sharma, Shashikant; Varma, Tarun; Asokan, K; Periasamy, C; Boolchandani, Dharmendar

    2017-01-01

    This work investigates the effect of annealing temperature on structural and optical properties of ZnO thin films grown over Si 100 and glass substrates using RF sputtering technique. Annealing temperature has been varied from 300 °C to 600 °C in steps of 100, and different microstructural parameters such as grain size, dislocation density, lattice constant, stress and strain have been evaluated. The structural and surface morphological characterization has been done using X-ray Diffraction (XRD) and Scanning Electron Microscope (SEM). XRD analysis reveals that the peak intensity of 002 crystallographic orientation increases with increased annealing temperature. Optical characterization of deposited films have been done using UV-Vis-NIR spectroscopy and photoluminescence spectrometer. An increase in optical bandgap of deposited ZnO thin films with increasing annealing temperature has been observed. The average optical transmittance was found to be more than 85% for all deposited films. Photoluminiscense spectra (PL) suggest that the crystalline quality of deposited film has increased at higher annealing temperature.

  2. Fabrication of AZO TCO Films by RF-sputtering and Their Physical Properties

    Directory of Open Access Journals (Sweden)

    Jang T.S.

    2016-01-01

    Full Text Available We report on the fabrication of Al-doped ZnO (AZO transparent-conductive oxide (TCO films on glass substrates by RF-sputtering, their physical properties, and the effect of thermal annealing on the AZO TCO films. The AZO films on glass substrates have a preferred orientation of the c-axis, irrespective of deposition conditions, which means that the AZO films have textured structures along the c-axis. The film thickness and surface roughness in the AZO films are proportional to plasma power and deposition time, while they are inverse-proportional to working gas ratio and working pressure. The AZO films have the optical transmittance over 80 % in the wavelength range of 400 – 1000 nm, irrespective of deposition conditions. The plasma power and the deposition time relatively give a large influence on the optical transmittance, compared to the working gas ratio and the working pressure. The AZO films deposited at room temperature have poor electrical properties, while the thermal annealing under Ar ambient significantly improves the electrical conductivity of the AZO films: an as-deposited sample has an electrical resistivity of 87 Wcm and an electron concentration of 1.3´1017 cm−3, while the annealed sample has an electrical resistivity of 3.7´10-2 Wcm and an electron concentration of 1.2´1020 cm−3.

  3. Synthesis of self-assembled Ge nano crystals employing reactive RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Hernandez H, A. [Universidad Autonoma del Estado de Hidalgo, Escuela Superior de Apan, Calle Ejido de Chimalpa Tlalayote s/n, Col. Chimalpa, Apan, Hidalgo (Mexico); Hernandez H, L. A. [IPN, Escuela Superior de Fisica y Matematicas, San Pedro Zacatenco, 07730 Ciudad de Mexico (Mexico); Monroy, B. M.; Santana R, G. [UNAM, Instituto de Investigaciones en Materiales, Apdo. Postal 70-360, 04510 Ciudad de Mexico (Mexico); Santoyo S, J.; Gallardo H, S. [IPN, Centro de Investigacion y de Estudios Avanzados, Departamento de Fisica, Apdo. Postal 14740, 07300 Ciudad de Mexico (Mexico); Marquez H, A. [Universidad de Guanajuato, Campus Irapuato-Salamanca, Departamento de Ingenieria Agricola, Km. 9 Carretera Irapuato-Silao, 36500 Irapuato, Guanajuato (Mexico); Mani G, P. G.; Melendez L, M. [Universidad Autonoma de Ciudad Juarez, Instituto de Ingenieria y Tecnologia, Departamento de Fisica y Matematicas, 32310 Ciudad Juarez, Chihuahua (Mexico)

    2016-11-01

    This work presents the results of a simple methodology able to control crystal size, dispersion and spatial distribution of germanium nano crystals (Ge-NCs). It takes advantage of a self-assembled process taken place during the deposit of the system SiO{sub 2}/Ge/SiO{sub 2} by reactive RF sputtering. Nanoparticles formation is controlled mainly by the roughness of the first SiO{sub 2} layer buy the ulterior interaction of the interlayer with the top layer also play a role. Structural quality of germanium nano crystals increases with roughness and the interlayer thickness. The tetragonal phase of germanium is produced and its crystallographic quality improves with interlayer thickness and oxygen partial pressure. Room temperature photoluminescence emission without a post growth thermal annealing process indicates that our methodology produces a low density of non-radiative traps. The surface topography of SiO{sub 2} reference samples was carried out by atomic force microscopy. The crystallographic properties of the samples were studied by grazing incidence X-ray diffraction at 1.5 degrees carried out in a Siemens D-5000 system employing the Cu Kα wavelength. (Author)

  4. Hysteretic current-voltage characteristics in RF-sputtered nanocrystalline TiO2 thin films

    International Nuclear Information System (INIS)

    Villafuerte, Manuel; Juarez, Gabriel; Heluani, Silvia P. de; Comedi, David

    2007-01-01

    We have measured the current-voltage characteristics at room temperature of a nanocrystalline TiO 2 thin film fabricated by reactive RF-sputtering deposition and sandwiched between ITO (indium-tin-oxide)-buffered glass substrate and an indium top electrode. The I-V characteristics are ohmic for low voltages and become non-linear, hysteretic and asymmetric as the voltage is increased. The system is shown to be well represented by two distinct resistance states in the non-ohmic region. Current transient evolutions were also measured for constant voltage excitations. The resistance is stable in time for voltages in the ohmic regime. In contrast, for voltages in the non-ohmic regime, the resistance has a small variation for a short period of time (order of tens seconds) and then increases with time. For those transients, long characteristic times (on the order of tens of minutes up to hours) were found. The behavior of the system is discussed on the basis of experimental results reported in the literature for similar systems and existing models for electric-field induced resistive switching

  5. Effect of substrate temperature and oxygen partial pressure on RF sputtered NiO thin films

    Science.gov (United States)

    Cheemadan, Saheer; Santhosh Kumar, M. C.

    2018-04-01

    Nickel oxide (NiO) thin films were deposited by RF sputtering process and the physical properties were investigated for varying substrate temperatures and oxygen partial pressure. The variation of the crystallographic orientation and microstructure of the NiO thin films with an increase in substrate temperature were studied. It was observed that NiO thin films deposited at 350 °C shows relatively good crystalline characteristics with a preferential orientation along (111) plane. With the optimum substrate temperature of 350 °C, the NiO thin films were deposited under various oxygen partial pressures at the same experimental conditions. The structural, optical and electrical properties of NiO thin films under varying oxygen partial pressure of 10%–50% were investigated. From XRD it is clear that the films prepared in the pure argon atmosphere were amorphous while the films in oxygen partial pressure exhibited polycrystalline NiO phase. SEM and AFM investigations unveil that the higher substrate temperature improves the microstructure of the thin films. It is revealed that the NiO thin films deposited at oxygen partial pressure of 40% and a substrate temperature of 350 °C, showed higher electrical conductivity with p-type characteristics.

  6. Substrate dependent hierarchical structures of RF sputtered ZnS films

    Science.gov (United States)

    Chalana, S. R.; Mahadevan Pillai, V. P.

    2018-05-01

    RF magnetron sputtering technique was employed to fabricate ZnS nanostructures with special emphasis given to study the effect of substrates (quartz, glass and quartz substrate pre-coated with Au, Ag, Cu and Pt) on the structure, surface evolution and optical properties. Type of substrate has a significant influence on the crystalline phase, film morphology, thickness and surface roughness. The present study elucidates the suitability of quartz substrate for the deposition of stable and highly crystalline ZnS films. We found that the role of metal layer on quartz substrate is substantial in the preparation of hierarchical ZnS structures and these structures are of great importance due to its high specific area and potential applications in various fields. A mechanism for morphological evolution of ZnS structures is also presented based on the roughness of substrates and primary nonlocal effects in sputtering. Furthermore, the findings suggest that a controlled growth of hierarchical ZnS structures may be achieved with an ordinary RF sputtering technique by changing the substrate type.

  7. Electrochemical behaviour of titanium coated stainless steel by r.f. sputtering in synthetic sweat solutions for electrode applications

    International Nuclear Information System (INIS)

    Fonseca, C.; Vaz, F.; Barbosa, M.A.

    2004-01-01

    The r.f. sputtering technique was used to deposit titanium thin films on stainless steel substrates, aiming at the application of the coated samples as skin contact materials for 'dry' active electrodes. In this work the electrochemical behaviour of the coated samples was investigated in synthetic sweat solutions and their performance was compared with that of uncoated stainless steel and bulk titanium. The characterisation of the samples was carried out by electrochemical techniques and scanning electron microscopy. The coated samples displayed corrosion resistance values in synthetic sweat solutions much higher than stainless steel samples and of the same order of the values measured for bulk titanium in the same conditions

  8. RF sputtering deposited a-IGZO films for LCD alignment layer application

    International Nuclear Information System (INIS)

    Wu, G.M.; Liu, C.Y.; Sahoo, A.K.

    2015-01-01

    Highlights: • a-IGZO nanolayer has been presented for alignment of liquid crystals in LCD. • RF sputtering deposition at an oblique angle has been performed to grow the films. • High transparency over 90% was obtained in the visible wavelength range. • The OCB cells exhibited fast on-off and short response time of 5.04 ms. • V–T characteristics proved high contrast ratio for LCD display applications. - Abstract: In this paper, amorphous indium gallium zinc oxide (a-IGZO) inorganic films were deposited at a fixed oblique angle using radio-frequency sputtering on indium tin oxide (ITO) glass as alternative alignment layer for liquid crystal displays. A series of experiments have been carried out to reveal the physical characteristics of the a-IGZO films, such as optical transmittance, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The special treatment a-IGZO films were used to fabricate liquid crystal (LC) cells and investigate the performances of these cells. Pretilt angles were measured with anti-parallel LC cells and voltage–transmittance (V–T) curve, contrast ratio, and response time were evaluated with optically compensated bend (OCB) LC cells. The electro-optical characteristics of the aligned homogenous LCs, and OCB mode cells based on the a-IGZO alignment layer were compared to those based on rubbing processed polyimide (PI). The results showed that the average transmittance in the visible wavelength range was higher than 90% for the a-IGZO alignment layer. The LC pretilt angle has been determined at about 6°. The evaluted cell critical voltage at maximum transmittance was 1.8 V, lower than the control cell using PI alignment layer. The OCB cell rise time and fall time were 1.55 ms and 3.49 ms, respectivly. A very quick response time of 5.04 ms has thus been achived. In addition, the study of V–T characteristics suggested higher contrast ratio for LCD display applications.

  9. RF sputtering deposited a-IGZO films for LCD alignment layer application

    Energy Technology Data Exchange (ETDEWEB)

    Wu, G.M., E-mail: wu@mail.cgu.edu.tw; Liu, C.Y.; Sahoo, A.K.

    2015-11-01

    Highlights: • a-IGZO nanolayer has been presented for alignment of liquid crystals in LCD. • RF sputtering deposition at an oblique angle has been performed to grow the films. • High transparency over 90% was obtained in the visible wavelength range. • The OCB cells exhibited fast on-off and short response time of 5.04 ms. • V–T characteristics proved high contrast ratio for LCD display applications. - Abstract: In this paper, amorphous indium gallium zinc oxide (a-IGZO) inorganic films were deposited at a fixed oblique angle using radio-frequency sputtering on indium tin oxide (ITO) glass as alternative alignment layer for liquid crystal displays. A series of experiments have been carried out to reveal the physical characteristics of the a-IGZO films, such as optical transmittance, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The special treatment a-IGZO films were used to fabricate liquid crystal (LC) cells and investigate the performances of these cells. Pretilt angles were measured with anti-parallel LC cells and voltage–transmittance (V–T) curve, contrast ratio, and response time were evaluated with optically compensated bend (OCB) LC cells. The electro-optical characteristics of the aligned homogenous LCs, and OCB mode cells based on the a-IGZO alignment layer were compared to those based on rubbing processed polyimide (PI). The results showed that the average transmittance in the visible wavelength range was higher than 90% for the a-IGZO alignment layer. The LC pretilt angle has been determined at about 6°. The evaluted cell critical voltage at maximum transmittance was 1.8 V, lower than the control cell using PI alignment layer. The OCB cell rise time and fall time were 1.55 ms and 3.49 ms, respectivly. A very quick response time of 5.04 ms has thus been achived. In addition, the study of V–T characteristics suggested higher contrast ratio for LCD display applications.

  10. Characteristics of Bilayer Molybdenum Films Deposited Using RF Sputtering for Back Contact of Thin Film Solar Cells

    Directory of Open Access Journals (Sweden)

    Sea-Fue Wang

    2014-01-01

    Full Text Available Mo films prepared under a single deposition condition seldom simultaneously obtain a low resistivity and a good adhesion necessary for use in solar cells. In order to surmount the obstacle, bilayer Mo films using DC sputtering at a higher working pressure and a lower working pressure have been attempted as reported in the literature. In this study, RF sputtering with different powers in conjunction with different working pressures was explored to prepare bilayer Mo film. The first bottom layer was grown at a RF sputtering power of 30 W and a working pressure of 12 mTorr, and the second top layer was deposited at 100 W and 4.5 mTorr. The films revealed a columnar growth with a preferred orientation along the (110 plane. The bilayer Mo films reported an electrical resistivity of 6.35 × 10−5 Ω-cm and passed the Scotch tape test for adhesion to the soda-lime glass substrate, thereby qualifying the bilayer Mo films for use as back metal contacts for CIGS substrates.

  11. Properties of nano structured Ag-TiO{sub 2} composite coating on stainless steel using RF sputtering method

    Energy Technology Data Exchange (ETDEWEB)

    Bakar, S. Abu; Jamuna-Thevi, K.; Abu, N.; Mohd Toff, M. R. [Advanced Materials Research Centre (AMREC), SIRIM Berhad, Lot 34, Jalan Hi- Tech 2/3, Kulim Hi-Tech Park, 09000 Kulim (Malaysia)

    2012-07-02

    RF Sputtering system is one of the Physical Vapour Deposition (PVD) methods that have been widely used to produce hard coating. This technique is used to deposit thin layers of metallic substrates such as stainless steel (SS). From this process, a good adhesiveness and wear resistance coating can be produced for biomedical applications. In this study, RF sputtering method was used to deposit TiO{sub 2}-Ag composite coatings via various deposition parameters. The parameters are RF power of 350W, gas composition (Ar: O{sub 2}) 50:5 and deposition time at 1, 2, 4 and 6 hours. Scanning Electron Microscopy (SEM), X-Ray Diffraction (XRD) and Raman spectroscopy were used to characterize surface area of coated samples. The formation of nanocrystalline thin film and the surface morphology were examined using SEM. The crystallite size of TiO{sub 2}-Ag composite coatings were estimated between 20-60 nm based on XRD analysis using Scherer equation and SEM evaluation. The Raman and XRD results suggested that the structure of the TiO{sub 2}-Ag consist of anatase and rutile phases. It also showed that the intensity of anatase peaks increased after samples undergone annealing process at 500 Degree-Sign C.

  12. ITO/InP solar cells: A comparison of devices fabricated by ion beam and RF sputtering of the ITO

    Science.gov (United States)

    Coutts, T. J.

    1987-01-01

    This work was performed with the view of elucidating the behavior of indium tin oxide/indium phosphide (ITO/InP) solar cells prepared by RF and ion beam sputtering. It was found that using RF sputter deposition of the ITO always leads to more efficient devices than ion beam sputter deposition. An important aspect of the former technique is the exposure of the single crystal p-InP substrates to a very low plasma power prior to deposition. Substrates treated in this manner have also been used for ion beam deposition of ITO. In this case the cells behave very similarly to the RF deposited cells, thus suggesting that the lower power plasma exposure (LPPE) is the crucial process step.

  13. Effects of gas flow rate on the structure and elemental composition of tin oxide thin films deposited by RF sputtering

    Science.gov (United States)

    Al-Mansoori, Muntaser; Al-Shaibani, Sahar; Al-Jaeedi, Ahlam; Lee, Jisung; Choi, Daniel; Hasoon, Falah S.

    2017-12-01

    Photovoltaic technology is one of the key answers for a better sustainable future. An important layer in the structure of common photovoltaic cells is the transparent conductive oxide. A widely applied transparent conductive oxide is tin oxide (SnO2). The advantage of using tin oxide comes from its high stability and low cost in processing. In our study, we investigate effects of working gas flow rate and oxygen content in radio frequency (RF)-sputtering system on the growth of intrinsic SnO2 (i-SnO2) layers. X-ray diffraction results showed that amorphous-like with nano-crystallite structure, and the surface roughness varied from 1.715 to 3.936 nm. X-Ray photoelectron spectroscopy analysis showed different types of point defects, such as tin interstitials and oxygen vacancies, in deposited i-SnO2 films.

  14. Oxygen Partial Pressure Impact on Characteristics of Indium Titanium Zinc Oxide Thin Film Transistor Fabricated via RF Sputtering.

    Science.gov (United States)

    Hsu, Ming-Hung; Chang, Sheng-Po; Chang, Shoou-Jinn; Wu, Wei-Ting; Li, Jyun-Yi

    2017-06-26

    Indium titanium zinc oxide (InTiZnO) as the channel layer in thin film transistor (TFT) grown by RF sputtering system is proposed in this work. Optical and electrical properties were investigated. By changing the oxygen flow ratio, we can suppress excess and undesirable oxygen-related defects to some extent, making it possible to fabricate the optimized device. XPS patterns for O 1s of InTiZnO thin films indicated that the amount of oxygen vacancy was apparently declined with the increasing oxygen flow ratio. The fabricated TFTs showed a threshold voltage of -0.9 V, mobility of 0.884 cm²/Vs, on-off ratio of 5.5 × 10⁵, and subthreshold swing of 0.41 V/dec.

  15. Effects of gas flow rate on the structure and elemental composition of tin oxide thin films deposited by RF sputtering

    Directory of Open Access Journals (Sweden)

    Muntaser Al-Mansoori

    2017-12-01

    Full Text Available Photovoltaic technology is one of the key answers for a better sustainable future. An important layer in the structure of common photovoltaic cells is the transparent conductive oxide. A widely applied transparent conductive oxide is tin oxide (SnO2. The advantage of using tin oxide comes from its high stability and low cost in processing. In our study, we investigate effects of working gas flow rate and oxygen content in radio frequency (RF-sputtering system on the growth of intrinsic SnO2 (i-SnO2 layers. X-ray diffraction results showed that amorphous-like with nano-crystallite structure, and the surface roughness varied from 1.715 to 3.936 nm. X-Ray photoelectron spectroscopy analysis showed different types of point defects, such as tin interstitials and oxygen vacancies, in deposited i-SnO2 films.

  16. SHI induced effects on the electrical and optical properties of HfO_2 thin films deposited by RF sputtering

    International Nuclear Information System (INIS)

    Manikanthababu, N.; Dhanunjaya, M.; Nageswara Rao, S.V.S.; Pathak, A.P.

    2016-01-01

    The continuous downscaling of Metal Oxide Semiconductor (MOS) devices has reached a limit with SiO_2 as a gate dielectric material. Introducing high-k dielectric materials as a replacement for the conservative SiO_2 is the only alternative to reduce the leakage current. HfO_2 is a reliable and an impending material for the wide usage as a gate dielectric in semiconductor industry. HfO_2 thin films were synthesized by RF sputtering technique. Here, we present a study of Swift Heavy Ion (SHI) irradiation with100 MeV Ag ions for studying the optical properties as well as 80 MeV Ni ions for studying the electrical properties of HfO_2/Si thin films. Rutherford Backscattering Spectrometry (RBS), Field Emission Scanning Electron Microscope (FESEM), energy-dispersive X-ray spectroscopy (EDS), profilometer and I–V (leakage current) measurements have been employed to study the SHI induced effects on both the structural, electrical and optical properties.

  17. The Effects of RF Sputtering Power and Gas Pressure on Structural and Electrical Properties of ITiO Thin Film

    Directory of Open Access Journals (Sweden)

    Accarat Chaoumead

    2012-01-01

    Full Text Available Transparent conductive titanium-doped indium oxide (ITiO films were deposited on corning glass substrates by RF magnetron sputtering method. The effects of RF sputtering power and Ar gas pressure on the structural and electrical properties of the films were investigated experimentally, using a 2.5 wt% TiO2-doped In2O3 target. The deposition rate was in the range of around 20~60 nm/min under the experimental conditions of 5~20 mTorr of gas pressure and 220~350 W of RF power. The lowest volume resistivity of 1.2×10−4  Ω-cm and the average optical transmittance of 75% were obtained for the ITiO film, prepared at RF power of 300 W and Ar gas pressure of 15 mTorr. This volume resistivity of 1.2×10−4  Ω-cm is low enough as a transparent conducting layer in various electrooptical devices, and it is comparable with that of ITO or ZnO:Al conducting layer.

  18. Morphology and life-time investigations of dry-lubricating MoS2 films deposited by RF-sputtering

    International Nuclear Information System (INIS)

    Menoud, C.; Kocher, H.; Hinterman, H.E.

    1985-01-01

    Morphology and life-time investigations in vacuum, dry and humid air, of thin, dry-lubricating MoS 2 -films, deposited by rf-sputtering, are reported, using scanning electron microscopical analysis (SEM) and pin on disc friction measurements. Beyond a certain relative humidity the life-time decreases rapidly by about two orders of magnitude, and the coefficient of friction increases from 0.02 to 0.04 in vacuum to 0.20 to 0.30 in humid air. Considering these changes, the useful life-time of a coating was defined as the number of revolutions at a given radius till the coefficient of friction reaches a value of 0.4. Life-time studies were also conducted with Rhodium interlayers and other substrate and pin materials. With the above life-time criterion and the selected pin-on-disc test conditions, the life-time does not show any significant change within an MoS 2 thickness range of 0.2 to 1.5 μm. Finally the life-time distribution of 160 depositions as well as some preliminary results on torque measurements with MoS 2 coated precision roller bearings are presented. (author)

  19. High-surface-quality nanocrystalline InN layers deposited on GaN templates by RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Valdueza-Felip, Sirona; Naranjo, Fernando B.; Gonzalez-Herraez, Miguel [Grupo de Ingenieria Fotonica, Departamento de Electronica, Escuela Politecnica Superior, Universidad de Alcala, Campus Universitario, 28871 Alcala de Henares, Madrid (Spain); Lahourcade, Lise; Monroy, Eva [Equipe mixte CEA-CNRS-UJF, Nanophysique et Semiconducteurs, INAC/SP2M/PSC, CEA-Grenoble, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Fernandez, Susana [Departamento de Energias Renovables, Energia Solar Fotovoltaica, Centro de Investigaciones Energeticas, Medioambientales y Tecnologicas (CIEMAT), Avda. Complutense 22, 28040 Madrid (Spain)

    2011-01-15

    We report a detailed study of the effect of deposition parameters on optical, structural, and morphological properties of InN films grown by reactive radio-frequency (RF) sputtering on GaN-on-sapphire templates in a pure nitrogen atmosphere. Deposition parameters under study are substrate temperature, RF power, and sputtering pressure. Wurtzite crystallographic structure with c-axis preferred growth orientation is confirmed by X-ray diffraction measurements. For the optimized deposition conditions, namely at a substrate temperature of 450 C and RF power of 30 W, InN films present a root-mean-square surface roughness as low as {proportional_to}0.4 nm, comparable to the underlying substrate. The apparent optical bandgap is estimated at 720 nm (1.7 eV) in all cases. However, the InN absorption band tail is strongly influenced by the sputtering pressure due to a change in the species of the plasma. (Copyright copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  20. Influence of ferroelectric layer on artificial multiferroic LSMO/BTO bilayers deposited by Dc and RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Ordonez, J. E.; Gomez, M. E.; Lopera, W. [Universidad del Valle, Department of Physics, A. A. 25360 Cali (Colombia)

    2016-11-01

    La{sub 2/3}Sr{sub 1/3}MnO{sub 3} (LSMO)/BaTiO{sub 3} (BTO) bilayers were deposited on (001) SrTiO{sub 3} substrates via Dc and RF sputtering at pure oxygen atmosphere at a substrate temperature of 830 degrees Celsius. We studied the structural, electrical and magnetic properties on LSMO/BTO bilayers, when LSMO thickness is fixed at nm and BTO thickness is varied from 20 to 100 nm. Reciprocal Space Maps in LSMO show a strained growth for all samples, while BTO layers are always relaxed. Magnetization and electrical measurements indicate the influence of the ferroelectric layer, due to saturation magnetization increases from 500 to 590 emu/cm{sup 3} and coercive field decreases from 178 to 82 Oe with BTO thickness. Mean Field mechanism is identified on all samples with critical exponent β between 0.42 and 0.54. Resistivity measurements show electron-electron and magnon-magnon scattering conduction mechanisms. The influence on magnetic and electrical properties of bilayers with BTO thickness is attributed to crystallographic strains at the interface and the corresponding relaxation with increasing BTO layer thickness. The thickness of the individual layers were obtained by X-ray reflectivity measurements in the bilayers, not shown. X-ray diffraction and Reciprocal Space Maps measurements show highly textured layers with preferential growth in the c-axis direction. (Author)

  1. Enhancement of optical transmittance and electrical resistivity of post-annealed ITO thin films RF sputtered on Si

    Science.gov (United States)

    Ali, Ahmad Hadi; Hassan, Zainuriah; Shuhaimi, Ahmad

    2018-06-01

    This paper reports on the enhancement of optical transmittance and electrical resistivity of indium tin oxide (ITO) transparent conductive oxides (TCO) deposited by radio frequency (RF) sputtering on Si substrate. Post-annealing was conducted on the samples at temperature ranges of 500-700 °C. From X-ray diffraction analysis (XRD), ITO (2 2 2) peak was observed after post-annealing indicating crystallization phase of the films. From UV-vis measurements, the ITO thin film shows highest transmittance of more than 90% at post-annealing temperature of 700 °C as compared to the as-deposited thin films. From atomic force microscope (AFM), the surface roughness becomes smoother after post-annealing as compared to the as-deposited. The lowest electrical resistivity for ITO sample is 6.68 × 10-4 Ω cm after post-annealed at 700 °C that are contributed by high carrier concentration and mobility. The improved structural and surface morphological characteristics helps in increasing the optical transmittance and reducing the electrical resistivity of the ITO thin films.

  2. Performance of RF sputtered p-Si/n-ZnO nanoparticle thin film heterojunction diodes in high temperature environment

    Energy Technology Data Exchange (ETDEWEB)

    Singh, Satyendra Kumar, E-mail: satyndra.singh.eee09@itbhu.ac.in [Department of Electronics and Communication Engineering, Model Institute of Engineering and Technology, Jammu, 181122 (India); Department of Electronics and Communication Engineering, Motilal Nehru National Institute of Technology, Allahabad, Uttar Pradesh, 211004 (India); Hazra, Purnima, E-mail: purnima.hazra@smvdu.ac.in [Department of Electronics and Communication Engineering, Shri Mata Vaishno Devi University, Katra, Jammu and Kashmir, 182320 (India)

    2017-04-01

    Highlights: • Synthesize ZnO nanoparticle thin film on p-Si substrate using RF sputtering method. • I–V and C–V characteristics of Si/ZnO heterojunction diode are studied. • High temperature performance is analyzed accounting barrier height inhomogeneities. • Gaussian distribution of BH inhomogeneities is considered to modify Richardson plot. • Modified R constant is 33.06 Acm{sup −2}K{sup −2}, i.e. nearer to theoretical value 32 Acm{sup −2}K{sup −2}. - Abstract: In this article, temperature-dependent current-voltage characteristics of n-ZnO/p-Si nanoparticle thin film heterojunction diode grown by RF sputtering technique are analyzed in the temperature range of 300–433 k to investigate the performance of the device in high temperature environment. The microstructural, morphological, optical and temptrature dependent electrical properties of as-grown nanoparticle thin film were characterized by X-ray diffractometer (XRD), atomic force microscopy (AFM), field emmision scanning electron microscopy (FESEM), energy-dispersive X-ray spectroscopy (EDX), variable angle ellipsometer and semiconductor device analyzer. XRD spectra of as-grown ZnO films are exhibited that highly c-axis oriented ZnO nanostructures are grown on p- Si〈100〉 substrate whereas AFM and FESEM images confirm the homogeneous deposition of ZnO nanoparticles on surface of Si substratewith minimum roughness.The optical propertiesof as-grown ZnO nanoparticles have been measured in the spectral range of 300–800 nm using variable angle ellipsometer.To measure electrical parameters of the device prototype in the temperature range of room temperature (300 K) to 433 K, large area ohmic contacts were fabricated on both side of the ZnO/Si heterostructure. From the current-voltage charcteristics of ZnO/Si heterojunction device, it is observed that the device exhibits rectifing nature at room temperature. However, with increase in temperature, reverse saturation current and barrier

  3. Effect of time varying phosphorus implantation on optoelectronics properties of RF sputtered ZnO thin-films

    Science.gov (United States)

    Murkute, Punam; Ghadi, Hemant; Saha, Shantanu; Chavan, Vinayak; Chakrabarti, Subhananda

    2018-03-01

    ZnO has potential application in the field of short wavelength devices like LED's, laser diodes, UV detectors etc, because of its wide band gap (3.34 eV) and high exciton binding energy (60 meV). ZnO possess N-type conductivity due to presence of defects arising from oxygen and zinc interstitial vacancies. In order to achieve P-type or intrinsic carrier concentration an implantation study is preferred. In this report, we have varied phosphorous implantation time and studied its effect on optical as well structural properties of RF sputtered ZnO thin-films. Implantation was carried out using Plasma Immersion ion implantation technique for 10 and 20 s. These films were further annealed at 900°C for 10 s in oxygen ambient to activate phosphorous dopants. Low temperature photoluminescence (PL) spectra measured two distinct peaks at 3.32 and 3.199 eV for 20 s implanted sample annealed at 900°C. Temperature dependent PL measurement shows slightly blue shift in peak position from 18 K to 300 K. 3.199 eV peak can be attributed to donoracceptor pair (DAP) emission and 3.32 eV peak corresponds to conduction-band-to-acceptor (eA0) transition. High resolution x-ray diffraction revels dominant (002) peak from all samples. Increasing implantation time resulted in low peak intensity suggesting a formation of implantation related defects. Compression in C-axis with implantation time indicates incorporation of phosphorus in the formed film. Improvement in surface quality was observed from 20 s implanted sample which annealed at 900°C.

  4. Significant effect of substrate temperature on the phase structure, optical and electrical properties of RF sputtered CIGS films

    Energy Technology Data Exchange (ETDEWEB)

    Yu Zhou; Yan Yong; Li Shasha; Zhang Yanxia; Yan Chuanpeng; Liu Lian; Zhang Yong [Key Laboratory of Magnetic Suspension Technology and Maglev Vehicle, Ministry of Education, Superconductivity and New energy R and D Center (SNERDC), Mail Stop 165, Southwest Jiaotong University, Chengdu 610031 (China); Zhao Yong, E-mail: yzhao@swjtu.edu.cn [Key Laboratory of Magnetic Suspension Technology and Maglev Vehicle, Ministry of Education, Superconductivity and New energy R and D Center (SNERDC), Mail Stop 165, Southwest Jiaotong University, Chengdu 610031 (China); School of Materials Science and Engineering, University of New South Wales, Sydney 2052, NSW (Australia)

    2013-01-01

    Highlights: Black-Right-Pointing-Pointer Secondary phase exist in the RF sputtered CIGS films as it deposited at 150 Degree-Sign C and 500 Degree-Sign C. Black-Right-Pointing-Pointer CIGS films deposited beyond 350 Degree-Sign C show (1 1 2) prefer orientation. Black-Right-Pointing-Pointer E{sub g} of the CIGS films increased with the increase of substrate temperature. Black-Right-Pointing-Pointer Conductivity of the films is affected by 'variable range hopping' mechanism. - Abstract: This work studied the effect of substrate temperature on the phase structure, optical and electrical properties of the one-step radio frequency sputtered Cu(In,Ga)Se{sub 2} (CIGS) thin films. X-ray diffraction (XRD) analysis revealed that all the deposited CIGS films are chalcopyrite phase with polycrystalline structure. The films deposited beyond the substrate temperature of 350 Degree-Sign C show (1 1 2) prefer orientation. Raman spectra reveal that the 150 Degree-Sign C deposited CIGS film coexists with Cu{sub 2-x}Se phase and the 500 Degree-Sign C deposited film contains ordered defect compound (ODC) phase. With the increase of substrate temperature, energy band gap of the CIGS film increase from 0.99 to 1.27 eV. Films deposited at higher temperature exhibit larger electrical conductivity. Conductivity of the CIGS films is dominated by 'variable range hopping' mechanism. The disorder in our CIGS the films is associated with the formation of intrinsic defects such as V{sub Se} and In{sub Cu} for their low formation energy.

  5. H2O2 sensing using HRP modified catalyst-free ZnO nanorods synthesized by RF sputtering

    Science.gov (United States)

    Srivastava, Amit; Kumar, Naresh; Singh, Priti; Singh, Sunil Kumar

    2017-06-01

    Catalyst-free ( 00 l) oriented ZnO nanorods (NRs) -based biosensor for the H2O2 sensing has been reported. The (002) oriented ZnO NRs as confirmed by X-ray diffraction were successfully grown on indium tin oxide (ITO) coated glass substrate by radio frequency (RF) sputtering technique without using any catalyst. Horseradish peroxidase (HRP) enzyme was immobilized on ZnO NRs by physical adsorption technique to prepare the biosensor. In this HRP/ZnO NR/ITO bioelectrode, nafion solution was added to form a tight membrane on surface. The prepared bioelectrode has been used for biosensing measurements by electrochemical analyzer. The electrochemical studies reveal that the prepared HRP/ZnO NR/ITO biosensor is highly sensitive to the detection of H2O2 over a linear range of 0.250-10 μM. The ZnO NR-based biosensor showed lower value of detection limit (0.125 μM) and higher sensitivity (13.40 µA/µM cm2) towards H2O2. The observed value of higher sensitivity attributed to larger surface area of ZnO nanostructure for effective loading of HRP besides its high electron communication capability. In addition, the biosensor also shows lower value of enzyme's kinetic parameter (Michaelis-Menten constant, K m) of 0.262 μM which indicates enhanced enzyme affinity of HRP to H2O2. The reported biosensor may be useful for various applications in biosensing, clinical, food, and beverage industry.

  6. The pH Sensing Properties of RF Sputtered RuO2 Thin-Film Prepared Using Different Ar/O2 Flow Ratio

    Directory of Open Access Journals (Sweden)

    Ali Sardarinejad

    2015-06-01

    Full Text Available The influence of the Ar/O2 gas ratio during radio frequency (RF sputtering of the RuO2 sensing electrode on the pH sensing performance is investigated. The developed pH sensor consists in an RF sputtered ruthenium oxide thin-film sensing electrode, in conjunction with an electroplated Ag/AgCl reference electrode. The performance and characterization of the developed pH sensors in terms of sensitivity, response time, stability, reversibility, and hysteresis are investigated. Experimental results show that the pH sensor exhibits super-Nernstian slopes in the range of 64.33–73.83 mV/pH for Ar/O2 gas ratio between 10/0–7/3. In particular, the best pH sensing performance, in terms of sensitivity, response time, reversibility and hysteresis, is achieved when the Ar/O2 gas ratio is 8/2, at which a high sensitivity, a low hysteresis and a short response time are attained simultaneously.

  7. Epitaxial ZnO gate dielectrics deposited by RF sputter for AlGaN/GaN metal-oxide-semiconductor high-electron-mobility transistors

    Science.gov (United States)

    Yoon, Seonno; Lee, Seungmin; Kim, Hyun-Seop; Cha, Ho-Young; Lee, Hi-Deok; Oh, Jungwoo

    2018-01-01

    Radio frequency (RF)-sputtered ZnO gate dielectrics for AlGaN/GaN metal-oxide-semiconductor high-electron-mobility transistors (MOS-HEMTs) were investigated with varying O2/Ar ratios. The ZnO deposited with a low oxygen content of 4.5% showed a high dielectric constant and low interface trap density due to the compensation of oxygen vacancies during the sputtering process. The good capacitance-voltage characteristics of ZnO-on-AlGaN/GaN capacitors resulted from the high crystallinity of oxide at the interface, as investigated by x-ray diffraction and high-resolution transmission electron microscopy. The MOS-HEMTs demonstrated comparable output electrical characteristics with conventional Ni/Au HEMTs but a lower gate leakage current. At a gate voltage of -20 V, the typical gate leakage current for a MOS-HEMT with a gate length of 6 μm and width of 100 μm was found to be as low as 8.2 × 10-7 mA mm-1, which was three orders lower than that of the Ni/Au Schottky gate HEMT. The reduction of the gate leakage current improved the on/off current ratio by three orders of magnitude. These results indicate that RF-sputtered ZnO with a low O2/Ar ratio is a good gate dielectric for high-performance AlGaN/GaN MOS-HEMTs.

  8. The Effect of Ar/O2 Ratio on Electrochromic Response Time of Ni Oxides Grown Using an RF Sputtering System

    Science.gov (United States)

    Ahn, Kwang-Soon; Nah, Yoon-Chae; Yum, Jun-Ho; Sung, Yung-Eun

    2002-02-01

    The effect of Ar:O2 ratio on the electrochromic properties and the response time of NiO grown by RF sputtering were investigated by in situ transmittance measurements with continuous potential cycling and pulse potential cycling. The transmittance difference, coloration efficiency, memory effect, and cycling stability were all found to be independent of the Ar:O2 ratio. However, the transmittance of the as-deposited NiO as well as the response time were significantly affected. This may be attributed to the excess of oxygen occupied interstitial sites in the sputtered NiO that could result in the generation of Ni3+ ions and interference with proton intercalation/deintercalation.

  9. Comparison of Cu(In, Ga)Se{sub 2} thin films deposited on different preferred oriented Mo back contact by RF sputtering from a quaternary target

    Energy Technology Data Exchange (ETDEWEB)

    Tian, Jing [Sichuan University, College of Materials Science and Engineering, Chengdu (China); Solar Energy Research Institute, Yunnan Normal University, Education Ministry Key Laboratory of Renewable Energy Advanced Materials and Manufacturing Technology, Kunming (China); Peng, Lianqin; Chen, Jinwei; Wang, Gang; Wang, Xueqin; Kang, Hong; Wang, Ruilin [Sichuan University, College of Materials Science and Engineering, Chengdu (China)

    2014-09-15

    The Cu(In, Ga)Se{sub 2} (CIGS) thin films were deposited on bare glass and DC sputtered preferential oriented Mo-coated glass by RF sputtering from a single quaternary target. The structural and morphological properties of the films were characterized by X-ray diffraction (XRD), Raman spectroscope, energy dispersive X-ray spectrometer (EDS) and atomic force microscope (AFM). Preferred orientation of the Mo back contact was tuned between (110) and (211) plane by controlling the thickness. All the deposited CIGS thin films show (112) preferred oriented chalcopyrite structures. The films prepared on Mo-coated glass show higher quality crystallinity, better stoichiometry composition and more smooth surface morphology. Especially, the film on (211) oriented Mo-coated glass with the best integrated performance is expected to be a candidate absorber for high-efficiency CIGS solar cell device. (orig.)

  10. Improvement of InN layers deposited on Si(111) by RF sputtering using a low-growth-rate InN buffer layer

    International Nuclear Information System (INIS)

    Valdueza-Felip, S.; Ibáñez, J.; Monroy, E.; González-Herráez, M.; Artús, L.; Naranjo, F.B.

    2012-01-01

    We investigate the influence of a low-growth-rate InN buffer layer on structural and optical properties of wurtzite nanocrystalline InN films deposited on Si(111) substrates by reactive radio-frequency sputtering. The deposition conditions of the InN buffer layer were optimized in terms of morphological and structural quality, leading to films with surface root-mean-square roughness of ∼ 1 nm under low-growth-rate conditions (60 nm/h). The use of the developed InN buffer layer improves the crystalline quality of the subsequent InN thick films deposited at high growth rate (180 nm/h), as confirmed by the narrowing of X-ray diffraction peaks and the increase of the average grain size of the layers. This improvement of the structural quality is further confirmed by Raman scattering spectroscopy measurements. Room temperature PL emission peaking at ∼ 1.58 eV is observed for InN samples grown with the developed buffer layer. The crystal and optical quality obtained for InN films grown on Si(111) using the low-growth-rate InN buffer layer become comparable to high-quality InN films deposited directly on GaN templates by RF sputtering. - Highlights: ► Improved RF-sputtered InN films on Si(111) using a low-growth-rate InN buffer layer. ► Enhanced structural quality confirmed by X-ray diffraction and Raman measurements. ► Room-temperature photoluminescence emission at 1.58 eV. ► InN films deposited with buffer layer on Si comparable to InN LAYERS on GaN templates.

  11. Improvement of InN layers deposited on Si(111) by RF sputtering using a low-growth-rate InN buffer layer

    Energy Technology Data Exchange (ETDEWEB)

    Valdueza-Felip, S., E-mail: sirona.valdueza@depeca.uah.es [Electronics Dept., Polytechnic School, University of Alcala, Madrid-Barcelona Road, km 33.6, 28871 Alcala de Henares, Madrid (Spain); Ibanez, J. [Institut de Ciencies de la Terra Jaume Almera, Consejo Superior de Investigaciones Cientificas (CSIC), c/Lluis Sole Sabaris s/n, 08028 Barcelona (Spain); Monroy, E. [CEA-Grenoble, INAC/SP2M/NPSC, 17 rue des Martyrs, 38054 Grenoble cedex 9 (France); Gonzalez-Herraez, M. [Electronics Dept., Polytechnic School, University of Alcala, Madrid-Barcelona Road, km 33.6, 28871 Alcala de Henares, Madrid (Spain); Artus, L. [Institut de Ciencies de la Terra Jaume Almera, Consejo Superior de Investigaciones Cientificas (CSIC), c/Lluis Sole Sabaris s/n, 08028 Barcelona (Spain); Naranjo, F.B. [Electronics Dept., Polytechnic School, University of Alcala, Madrid-Barcelona Road, km 33.6, 28871 Alcala de Henares, Madrid (Spain)

    2012-01-31

    We investigate the influence of a low-growth-rate InN buffer layer on structural and optical properties of wurtzite nanocrystalline InN films deposited on Si(111) substrates by reactive radio-frequency sputtering. The deposition conditions of the InN buffer layer were optimized in terms of morphological and structural quality, leading to films with surface root-mean-square roughness of {approx} 1 nm under low-growth-rate conditions (60 nm/h). The use of the developed InN buffer layer improves the crystalline quality of the subsequent InN thick films deposited at high growth rate (180 nm/h), as confirmed by the narrowing of X-ray diffraction peaks and the increase of the average grain size of the layers. This improvement of the structural quality is further confirmed by Raman scattering spectroscopy measurements. Room temperature PL emission peaking at {approx} 1.58 eV is observed for InN samples grown with the developed buffer layer. The crystal and optical quality obtained for InN films grown on Si(111) using the low-growth-rate InN buffer layer become comparable to high-quality InN films deposited directly on GaN templates by RF sputtering. - Highlights: Black-Right-Pointing-Pointer Improved RF-sputtered InN films on Si(111) using a low-growth-rate InN buffer layer. Black-Right-Pointing-Pointer Enhanced structural quality confirmed by X-ray diffraction and Raman measurements. Black-Right-Pointing-Pointer Room-temperature photoluminescence emission at 1.58 eV. Black-Right-Pointing-Pointer InN films deposited with buffer layer on Si comparable to InN LAYERS on GaN templates.

  12. Effect of substrate temperature in the structural, optical and ferroelectric properties of thin films of BaTiO{sub 3} deposited by RF sputtering; Efecto de la temperatura de substrato en las propiedades estructurales, opticas y ferroelectricas de peliculas delgadas de BaTiO{sub 3} depositadas por RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Marquez H, A. [Universidad Autonoma de San Luis Potosi, Coordinacion Academica Region Altiplano, Carretera a Cedral Km. 5 -600, Matehuala, 78800 San Luis Potosi (Mexico); Hernandez R, E.; Zapata T, M. [IPN, Centro de Investigacion en Ciencia Aplicada y Tecnologia Avanzada, Unidad Legaria, Calz. Legaria 694, Col. Irrigacion, 11500 Mexico D. F. (Mexico); Calzadilla A, O. [Universidad de la Habana, Facultad de Fisica-IMRE, San Lazaro y L. Municipio Plaza de la Revolucion, La Habana (Cuba); Melendez L, M. [IPN, Centro de Investigacion y de Estudios Avanzados, Departamento de Fisica, Apdo. Postal 14-740, 07000 Mexico D. F. (Mexico)

    2012-07-01

    Thin films of Barium Titanate (BaTiO{sub 3}) were grown on nichrome and quartz substrates, using a BaTiO{sub 3} target, by RF sputtering technique. We varied the substrate temperature in order to study its effect on the structural, optical and ferroelectric properties of the samples. The results of the X-ray diffraction showed tetragonal structure with increases of the crystallinity as increases the substrate temperature. Furthermore, it observed by ultraviolet-visible spectroscopy that the band gap decreased as the substrate temperature increases showing abrupt sharp decrease at 494.8{sup o} C. The ferroelectric properties of the films showed a dependence with substrate temperature, the best ferroelectric answer was obtained at 494.8{sup o} C. (Author)

  13. Photoluminescence and charge-transport characteristics of nano-columnar titanium dioxide films prepared by rf-sputtering on alumina templates

    Science.gov (United States)

    Kheirandish, E.; Hosseini, T.; Yavarishad, N.; King, S.; Kouklin, N.

    2018-02-01

    The current study presents the synthesis and characterization of poly-crystalline TiO2 thin-film prepared by rf-sputtering on top of a highly regimented nanoporous Au-coated Al2O3 substrate. The film’s physical and electronic properties were characterized via SEM, EDS, x-ray diffraction and RAMAN spectroscopy as well as temperature dependent photoluminescence (PL) and I-V measurements. The films feature a 1D, columnar-like structure and exhibit a medium strength, spectrally-broad light emission in the UV-visible range. PL emission shows a weak T-dependence and is attributed to interband electronic transitions and defect-assisted radiative recombinations. The charge transport is confirmed to be polaronic in nature with both thermally-assisted hopping and quantum mechanical tunneling regulating a charge flow within the columns in the intermediate temperature regime of ˜200-320 K. These results open a door to utilizing nano-textured substrates/scaffolds to produce electronic-grade anatase TiO2 by sputtering for advanced opto-electronic device applications.

  14. SHI induced effects on the electrical and optical properties of HfO{sub 2} thin films deposited by RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Manikanthababu, N.; Dhanunjaya, M.; Nageswara Rao, S.V.S.; Pathak, A.P., E-mail: appsp@uohyd.ernet.in

    2016-07-15

    The continuous downscaling of Metal Oxide Semiconductor (MOS) devices has reached a limit with SiO{sub 2} as a gate dielectric material. Introducing high-k dielectric materials as a replacement for the conservative SiO{sub 2} is the only alternative to reduce the leakage current. HfO{sub 2} is a reliable and an impending material for the wide usage as a gate dielectric in semiconductor industry. HfO{sub 2} thin films were synthesized by RF sputtering technique. Here, we present a study of Swift Heavy Ion (SHI) irradiation with100 MeV Ag ions for studying the optical properties as well as 80 MeV Ni ions for studying the electrical properties of HfO{sub 2}/Si thin films. Rutherford Backscattering Spectrometry (RBS), Field Emission Scanning Electron Microscope (FESEM), energy-dispersive X-ray spectroscopy (EDS), profilometer and I–V (leakage current) measurements have been employed to study the SHI induced effects on both the structural, electrical and optical properties.

  15. Morphology, optical and electrical properties of Cu-Ni nanoparticles in a-C:H prepared by co-deposition of RF-sputtering and RF-PECVD

    Energy Technology Data Exchange (ETDEWEB)

    Ghodselahi, T., E-mail: ghodselahi@ipm.ir [School of Physics, Institute for Research in Fundamental Sciences (IPM), P.O. Box 19395-5531, Tehran (Iran, Islamic Republic of); Vesaghi, M.A. [School of Physics, Institute for Research in Fundamental Sciences (IPM), P.O. Box 19395-5531, Tehran (Iran, Islamic Republic of); Department of Physics, Sharif University of Technology, P.O. Box 11365-9161, Tehran (Iran, Islamic Republic of); Gelali, A.; Zahrabi, H.; Solaymani, S. [Young Researchers Club, Islamic Azad University, Kermanshah Branch, Kermanshah (Iran, Islamic Republic of)

    2011-11-01

    We report optical and electrical properties of Cu-Ni nanoparticles in hydrogenated amorphous carbon (Cu-Ni NPs - a-C:H) with different surface morphology. Ni NPs with layer thicknesses of 5, 10 and 15 nm over Cu NPs - a-C:H were prepared by co-deposition of RF-sputtering and RF-Plasma Enhanced Chemical Vapor Deposition (RF-PECVD) from acetylene gas and Cu and Ni targets. A nonmetal-metal transition was observed as the thickness of Ni over layer increases. The surface morphology of the sample was described by a two dimensional (2D) Gaussian self-affine fractal, except the sample with 10 nm thickness of Ni over layer, which is in the nonmetal-metal transition region. X-ray diffraction profile indicates that Cu NPs and Ni NPs with fcc crystalline structure are formed in these films. Localized Surface Plasmon Resonance (LSPR) peak of Cu NPs is observed around 600 nm in visible spectra, which is widen and shifted to lower wavelengths as the thickness of Ni over layer increases. The variation of LSPR peak width correlates with conductivity variation of these bilayers. We assign both effects to surface electron delocalization of Cu NPs.

  16. Low temperature rf sputtering deposition of (Ba, Sr) TiO3 thin film with crystallization enhancement by rf power supplied to the substrate

    International Nuclear Information System (INIS)

    Yoshimaru, Masaki; Takehiro, Shinobu; Abe, Kazuhide; Onoda, Hiroshi

    2005-01-01

    The (Ba, Sr) TiO 3 thin film deposited by radio frequency (rf) sputtering requires a high deposition temperature near 500 deg. C to realize a high relative dielectric constant over of 300. For example, the film deposited at 330 deg. C contains an amorphous phase and shows a low relative dielectric constant of less than 100. We found that rf power supplied not only to the (Ba, Sr) TiO 3 sputtering target, but also to the substrate during the initial step of film deposition, enhanced the crystallization of the (Ba, Sr) TiO 3 film drastically and realized a high dielectric constant of the film even at low deposition temperatures near 300 deg. C. The 50-nm-thick film with only a 10 nm initial layer deposited with the substrate rf biasing is crystallized completely and shows a high relative dielectric constant of 380 at the deposition temperature of 330 deg. C. The (Ba, Sr) TiO 3 film deposited at higher temperatures (upwards of 400 deg. C) shows preferred orientation, while the film deposited at 330 deg. C with the 10 nm initial layer shows a preferred orientation on a -oriented ruthenium electrode. The unit cell of (Ba, Sr) TiO 3 (111) plane is similar to that of ruthenium (001) plane. We conclude that the rf power supplied to the substrate causes ion bombardments on the (Ba, Sr) TiO 3 film surface, which assists the quasiepitaxial growth of (Ba, Sr) TiO 3 film on the ruthenium electrode at low temperatures of less than 400 deg. C

  17. Low temperature rf sputtering deposition of (Ba, Sr) TiO3 thin film with crystallization enhancement by rf power supplied to the substrate

    Science.gov (United States)

    Yoshimaru, Masaki; Takehiro, Shinobu; Abe, Kazuhide; Onoda, Hiroshi

    2005-05-01

    The (Ba, Sr) TiO3 thin film deposited by radio frequency (rf) sputtering requires a high deposition temperature near 500 °C to realize a high relative dielectric constant over of 300. For example, the film deposited at 330 °C contains an amorphous phase and shows a low relative dielectric constant of less than 100. We found that rf power supplied not only to the (Ba, Sr) TiO3 sputtering target, but also to the substrate during the initial step of film deposition, enhanced the crystallization of the (Ba, Sr) TiO3 film drastically and realized a high dielectric constant of the film even at low deposition temperatures near 300 °C. The 50-nm-thick film with only a 10 nm initial layer deposited with the substrate rf biasing is crystallized completely and shows a high relative dielectric constant of 380 at the deposition temperature of 330 °C. The (Ba, Sr) TiO3 film deposited at higher temperatures (upwards of 400 °C) shows preferred orientation, while the film deposited at 330 °C with the 10 nm initial layer shows a preferred orientation on a -oriented ruthenium electrode. The unit cell of (Ba, Sr) TiO3 (111) plane is similar to that of ruthenium (001) plane. We conclude that the rf power supplied to the substrate causes ion bombardments on the (Ba, Sr) TiO3 film surface, which assists the quasiepitaxial growth of (Ba, Sr) TiO3 film on the ruthenium electrode at low temperatures of less than 400 °C.

  18. Growth of amorphous Zn–Sn–O thin films by RF sputtering for buffer layers of CuInSe2 and SnS solar cells

    International Nuclear Information System (INIS)

    Chang, Shao-Wei; Ishikawa, Kaoru; Sugiyama, Mutsumi

    2015-01-01

    We propose using amorphous Zn–Sn–O (α-ZTO) deposited by RF sputtering as an alternative n-type buffer layer for Cu(In,Ga)Se 2 and SnS solar cells. The order of the carrier density, n, is increased from the order of 10 15 to 10 17 cm −1 as the Sn/(Sn + Zn) atomic ratio increases from 0.29 to 0.40. On the other hand, the order of n decreased from 10 17 to 10 11 cm −1 as the oxygen partial pressure increased from 0 to 10%. Further, for the α-ZTO film with the Sn/(Sn + Zn) atomic ratio at 0.38 and the oxygen partial pressure at 0%, valence band discontinuities of α-ZTO/CuInSe 2 and α-ZTO/SnS were determined using photoelectron yield spectroscopy measurements. The band discontinuities of each of these interfaces form a spike structure in the conduction band offset, which enables a high-performance solar cell to be obtained. - Highlights: • We propose using amorphous Zn–Sn–O as a n-type layer for Cu(In,Ga)Se 2 and SnS solar cells. • The carrier density was controlled by total and/or oxygen partial pressure during sputtering. • Valence band discontinuities of Zn–Sn–O/CuInSe 2 and Zn–Sn–O/SnS were determined. • The conduction band discontinuities of each of these interfaces form a spike structure

  19. Preparation of a Non-Polar ZnO Film on a Single-Crystal NdGaO3 Substrate by the RF Sputtering Method

    Science.gov (United States)

    Kashiwaba, Y.; Tanaka, Y.; Sakuma, M.; Abe, T.; Imai, Y.; Kawasaki, K.; Nakagawa, A.; Niikura, I.; Kashiwaba, Y.; Osada, H.

    2018-04-01

    Preparation of non-polar ZnO ( 11\\overline{2} 0 ) films on single-crystal NdGaO3 (NGO) (001) substrates was successfully achieved by the radio frequency (RF) sputtering method. Orientation, deposition rate, and surface roughness of ZnO films strongly depend on the working pressure. Characteristics of ZnO films deposited on single-crystal NGO (001) substrates were compared with those of ZnO films deposited on single-crystal sapphire ( 01\\overline{1} 2 ) substrates. An x-ray diffraction peak of the ZnO ( 11\\overline{2} 0 ) plane was observed on ZnO films deposited on single-crystal NGO (001) substrates under working pressure of less than 0.5 Pa. On the other hand, uniaxially oriented ZnO ( 11\\overline{2} 0 ) films on single-crystal sapphire ( 01\\overline{1} 2 ) substrates were observed under working pressure of 0.1 Pa. The mechanism by which the diffraction angle of the ZnO ( 11\\overline{2} 0 ) plane on single-crystal NGO (001) substrates was shifted is discussed on the basis of anisotropic stress of lattice mismatch. The deposition rate of ZnO films decreased with an increase in working pressure, and the deposition rate on single-crystal NGO (001) substrates was larger than that on single-crystal sapphire ( 01\\overline{1} 2 ) substrates. Root mean square (RMS) roughness of ZnO films increased with an increase in working pressure, and RMS roughness of ZnO films on single-crystal NGO (001) substrates was smaller than that of ZnO films on single-crystal sapphire ( 01\\overline{1} 2 ) substrates even though the film thickness on single-crystal NGO (001) substrates was greater than that on sapphire substrates. It is thought that a single-crystal NGO (001) substrate is useful for deposition of non-polar ZnO ( 11\\overline{2} 0 ) films.

  20. Comparison study of transparent RF-sputtered ITO/AZO and ITO/ZnO bilayers for near UV-OLED applications

    Science.gov (United States)

    Rezaie, Mahdiyar Nouri; Manavizadeh, Negin; Abadi, Ehsan Mohammadi Nasr; Nadimi, Ebrahim; Boroumand, Farhad Akbari

    2017-01-01

    Hybrid inorganic/organic light-emitting diodes have attracted much attention in the field of luminescent electronics due to the desired incorporation of high optoelectronic features of inorganic materials with the processability and variety of organic polymers. To generate and emit a near ultraviolet (N-UV) ray, wide band gap semiconductors can be applied in the organic light-emitting diodes (OLEDs). In this paper, zinc oxide (ZnO) and aluminum-doped ZnO (AZO) thin films are deposited by radio frequency (RF) sputtering above the ITO electrode and poly [2-methoxy-5-(2-ethyl-hexyloxy)-1,4-phenylene-vinylene] (MEH-PPV) conjugated polymer is utilized as a complementary p-type semiconductor in OLED structure. The impact of ZnO and AZO thickness on the structural, electrical, optical and morphological properties of ITO/AZO and ITO/ZnO bilayers are scrutinized and compared. Results show that with the enlargement of both ZnO and AZO film thickness, the physical properties are gradually improved resulting in the better quality of transparent conducting thin film. The average electrical resistivity of 8.4 × 10-4 and 1.1 × 10-3 Ω-cm, average sheet resistance of 32.9 and 42.3 Ω/sq, average transmittance of 88.3 and 87.3% and average FOM of 1.0 × 104 and 7.4 × 103 (Ω-cm)-1 are obtained for ITO/AZO and ITO/ZnO bilayers, respectively. Moreover, comparing the results indicates that the strain and the stress within the ITO/AZO bilayer are decreased nearly 19% with respect to ITO/ZnO bilayer which yield higher quality of crystal. Consequently, the physical properties of ITO/AZO bilayer is found to be superior regarding ITO/ZnO bilayer. For fabricated UV-OLEDs, the turn-on voltages, the characteristic energy (Et) and the total concentration of traps (Nt) for the devices with the structures of ITO/ZnO/MEH-PPV/Al and ITO/AZO/MEH-PPV/Al are obtained 12 and 14 V, 0.108 and 0.191 eV, 9.33 × 1016 and 5.22 × 1016 cm-3, respectively. Furthermore, according to the electroluminescence

  1. Optical and structural characterization of titanium dioxide films growth by the r f-sputtering technique; Caracterizacion optica y estructural de peliculas de dioxido de titanio crecidas por la tecnica de rf-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Florido C, A.; Calderon, A. [CICATA-IPN, Av. Legaria 694, 11500 Mexico D.F. (Mexico); Mendoza A, J.G.; Becerril, M.; Zelaya A, O. [CINVESTAV, A.P. 14-740, 07000 Mexico D.F. (Mexico)

    2007-07-01

    Full text: The elaboration of a series of grown films of TiO on Corning glaze substrates, as well as silicon, by means of the rf-sputtering technique using one power of 160 watts, with the objective of obtaining the anatase phase which one presents better activity for applications in photo catalysis. In the process of growth it was used a temperature in the range from 300 to 600 C and a separation distance among the target and the substrate of 3.5 cm. The used atmosphere was a mixture of argon and oxygen. It was carried out the characterization of the films obtained by means of UV-vis spectrophotometry, and photoluminescence (FL). The microstructure analysis was carried out by means of X-ray diffraction (XRD), micro-Raman (MR), and atomic force microscopy (AFM). By means of the diffractographs it was determined the grain size. Our results show that in our films they are present the anatase and rutile phases of the titanium dioxide. The analysis of the results of optical spectra shows a forbidden band of the titanium dioxide around 3.2 eV. (Author)

  2. Comparative investigation on cation-cation (Al-Sn) and cation-anion (Al-F) co-doping in RF sputtered ZnO thin films: Mechanistic insight

    Energy Technology Data Exchange (ETDEWEB)

    Mallick, Arindam; Basak, Durga, E-mail: sspdb@iacs.res.in

    2017-07-15

    Highlights: • Comparative study on Al, Al-Sn and Al-F doped ZnO films has been carried out. • High transparent Al-F co-doped film shows three times enhanced carrier density. • Al-F co-doped film shows larger carrier relaxation time. • Al-Sn co-doped films shows carrier transport dominated by impurity scattering. • Al-F co-doped ZnO film can be applied as transparent electrode. - Abstract: Herein, we report a comparative mechanistic study on cation-cation (Al-Sn) and cation-anion (Al-F) co-doped nanocrystalline ZnO thin films grown on glass substrate by RF sputtering technique. Through detailed analyses of crystal structure, surface morphology, microstructure, UV-VIS-NIR transmission-reflection and electrical transport property, the inherent characteristics of the co-doped films were revealed and compared. All the nanocrystalline films retain the hexagonal wurtzite structure of ZnO and show transparency above 90% in the visible and NIR region. As opposed to expectation, Al-Sn (ATZO) co-doped film show no enhanced carrier concentration consistent with the probable formation of SnO{sub 2} clusters supported by the X-ray photoelectron spectroscopy study. Most interestingly, it has been found that Al-F (AFZO) co-doped film shows three times enhanced carrier concentration as compared to Al doped and Al-Sn co-doped films attaining a value of ∼9 × 10{sup 20} cm{sup −3} due to the respective cation and anion substitution. The carrier relaxation time increases in AFZO while it decreases significantly for ATZO film consistent with the concurrence of the impurity scattering in the latter.

  3. Low Fatigue in Epitaxial Pb(Zr0.2Ti0.8)O3 on Si Substrates with LaNiO3 Electrodes by RF Sputtering

    Science.gov (United States)

    Wang, Chun; Kryder, Mark H.

    2009-09-01

    Epitaxial PZT (001) thin films with a LaNiO3 bottom electrode were deposited by radio-frequency (RF) sputtering onto Si(001) single-crystal substrates with SrTiO3/TiN buffer layers. Pb(Zr0.2Ti0.8)O3 (PZT) samples were shown to consist of a single perovskite phase and to have an (001) orientation. The orientation relationship was determined to be PZT(001)[110]∥LaNiO3(001)[110]∥SrTiO3 (001)[110]∥TiN(001)[110]∥Si(001)[110]. Atomic force microscope (AFM) measurements showed the PZT films to have smooth surfaces with a roughness of 1.15 nm. The microstructure of the multilayer was studied using transmission electron microscopy (TEM). Electrical measurements were conducted using both Pt and LaNiO3 as top electrodes. The measured remanent polarization P r and coercive field E c of the PZT thin film with Pt top electrodes were 23 μC/cm2 and 75 kV/cm, and were 25 μC/cm2 and 60 kV/cm for the PZT film with LaNiO3 top electrodes. No obvious fatigue after 1010 switching cycles indicated good electrical endurance of the PZT films using LaNiO3 electrodes, compared with the PZT film with Pt top electrodes showing a significant polarization loss after 108 cycles. These PZT films with LaNiO3 electrodes could be potential recording media for probe-based high-density data storage.

  4. Properties of different temperature annealed Cu(In,Ga)Se{sub 2} and Cu(In,Ga){sub 2}Se{sub 3.5} films prepared by RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Yu Zhou; Liu Lian; Yan Yong; Zhang Yanxia; Li Shasha; Yan Chuanpeng; Zhang Yong [Key Laboratory of Magnetic Suspension Technology and Maglev Vehicle, Ministry of Education of China, Superconductivity and New Energy R and D Center (SNERDC), Mail Stop 165, Southwest Jiaotong University, Chengdu 610031 (China); Zhao Yong, E-mail: yzhao@swjtu.edu.cn [Key Laboratory of Magnetic Suspension Technology and Maglev Vehicle, Ministry of Education of China, Superconductivity and New Energy R and D Center (SNERDC), Mail Stop 165, Southwest Jiaotong University, Chengdu 610031 (China); School of Materials Science and Engineering, University of New South Wales, Sydney 2052, NSW (Australia)

    2012-11-15

    Highlights: Black-Right-Pointing-Pointer The Cu(In,Ga)Se{sub 2} and Cu(In,Ga)2Se{sub 3.5} films follow different process to form CIGS phase. Black-Right-Pointing-Pointer Composition loss of the annealed Cu(In,Ga)Se{sub 2} and Cu(In,Ga){sub 2}Se{sub 3.5} films are different. Black-Right-Pointing-Pointer Hexagonal CuSe phase exhibits unique transport feature. Black-Right-Pointing-Pointer Conductivity of the CIGS films is affected by the 'variable range hopping' mechanism. - Abstract: We have investigated the effect of annealing temperature on structural, compositional, electrical properties of the one-step RF sputtered Cu(In,Ga)Se{sub 2} and Cu(In,Ga){sub 2}Se{sub 3.5} films. After the annealing at various temperatures, loss of Se element is significant for the Cu(In,Ga)Se{sub 2} films and meanwhile composition of the annealed Cu(In,Ga){sub 2}Se{sub 3.5} films keeps almost constant. The as-deposited Cu(In,Ga)Se{sub 2} and Cu(In,Ga){sub 2}Se{sub 3.5} films show amorphous structure and they follow different transformation process to form chalcopyrite structure. Electrical conductivity of the annealed CIGS films related to their chemical composition. Cu(In,Ga)Se{sub 2} films annealed at 150 Degree-Sign C show unique electron transport mechanism for the formation of hexagonal CuSe phase. Electrical conductivity of the chalcopyrite structure films are dominated by the 'variable range hopping' transport mechanism. The annealed Cu(In,Ga){sub 2}Se{sub 3.5} films present higher density of disorders than the annealed Cu(In,Ga)Se{sub 2} films for their significant Cu deficient composition.

  5. Magnetostrictive thin films prepared by RF sputtering

    International Nuclear Information System (INIS)

    Carabias, I.; Martinez, A.; Garcia, M.A.; Pina, E.; Gonzalez, J.M.; Hernando, A.; Crespo, P.

    2005-01-01

    Fe 80 B 20 thin films have been prepared by ion beam sputtering magnetron on room temperature. The films were fabricated on different substrates to compare the different magnetic and structural properties. In particular the growth of films on flexible substrates (PDMS, Kapton) has been studied to allow a simple integration of the system in miniaturized magnetostrictive devices. X-ray diffraction patterns indicate that films are mainly amorphous although the presence of some Fe nanoparticles cannot be ruled out. The coercive field of thin films ranges between 15 and 35 Oe, depending on substrate. Magnetostriction measurements indicate the strong dependence of the saturation magnetostriction with the substrate. Samples on flexible substrates exhibit a better performance than samples deposited onto glass substrates

  6. RF sputtering of hydrocarbon polymers and their derivates

    Czech Academy of Sciences Publication Activity Database

    Biederman, H.; Stelmashuk, Vitaliy; Kholodkov, I.; Choukourov, A.; Slavinska, D.

    -, č. 174 (2003), s. 27-32 ISSN 0257-8972 Institutional research plan: CEZ:AV0Z2043910 Keywords : vapor-deposition polymerization, plasma polymerization, fluorcarbon films Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 1.410, year: 2003

  7. Some Characteristics of r.f. Sputtered CuInS2 Thin Films

    International Nuclear Information System (INIS)

    Samaan, A.N.Y.; Al-Saffar, I.S.; Wasim, S.M.; Hill, A.E.; Armour, D.G.; Tomlinson, R.D.

    1983-01-01

    Electrical data from sputtered and annealed p-type CuInS 2 thin films have been obtained over a range of temperatures. An analysis of hole mobility vs. temperature data indicates that the charge carriers are predominantly scattered by neutral and ionized impurities and by acoustic-mode vibrations

  8. Studying the Properties of RF-Sputtered Nanocrystalline Tin-Doped Indium Oxide

    Directory of Open Access Journals (Sweden)

    Abd El-Hady B. Kashyout

    2011-01-01

    Full Text Available The ceramic target of Indium tinoxide (ITO (90% In2O3-10%SnO2 has been used to prepare transparent semiconductive thin films on glass substrate by RF magnetron sputtering at room temperature. The properties of the thin films are affected by controlling the deposition parameters, namely, RF power values and deposition times. The structure, morphology, optical and electrical properties of the thin films are investigated using X-ray diffraction (XRD, field emission scanning electron microscope (FESEM, atomic force microscope (AFM, UV-Vis spectrophotometer, and four-point probe measurement. Nanoparticles of 10–20 nm are measured and confirmed using both FESEM and AFM. The main preferred orientations of the prepared thin films are (222 and (400 of the cubic ITO structure. The transparent semiconductive films have high transmittance within the visible range of values 80–90% and resistivity of about 1.62×10−4 Ω⋅cm.

  9. Bioactivity and Surface Reactivity of RF-sputtered Calcium Phosphate Thin Films

    NARCIS (Netherlands)

    Wal, Edwin van der

    2003-01-01

    Calcium phosphates (CaP) are known to be bioactive, i.e. able to bond to bone. This makes CaPs very suitable to be aplied as thin coatings on bone-implants. In this work we studied the physicochemical behaviour of CaP coatings applied with radio frequency (RF) magnetron sputtering, a deposition

  10. Optical and electrical characterization of r.f. sputtered ITO films developed as art protection coatings

    International Nuclear Information System (INIS)

    Boycheva, Sylvia; Sytchkova, Anna Krasilnikova; Piegari, Angela

    2007-01-01

    Transparent and conductive tin-doped indium oxide (ITO) films have been prepared by r.f. plasma sputtering technique in Ar and Ar + O 2 gas mixture. The influence of the deposition conditions, film thickness, and substrate heating, as well as the post-annealing treatment on the optical and electrical properties of the ITO films has been investigated. The present study has extended the optical behaviour characterization of the ITO films in a wide UV-VIS-IR spectral region in addition to the comprehensive optical studies of this material at shorter wavelengths. The optical constants: refractive index (n), extinction (k) and absorption (α) coefficient, and the optical band gap (E go ) have been calculated for the ITO films in the spectral range between 350 and 2500 nm. A combination of several well-known theoretical models has been applied to describe precisely the complex optical behaviour of ITO films in separate spectral parts. In this approach, a good overlapping between the experimental and the simulated spectra in the whole investigated spectral region has been achieved. The deposition conditions and the optical and electrical properties of the ITO films have been optimized with respect to the requirements for their applications in art protection coatings

  11. Irreversible thermochromic response of RF sputtered nanocrystalline BaWO4 films for smart window applications

    Directory of Open Access Journals (Sweden)

    C. Anil Kumar

    2015-10-01

    Full Text Available We report irreversible thermochromic behaviour of BaWO4 (BWO films for the first time. BWO films have been deposited at different substrate temperatures (RT, 200, 400, 600 and 800 °C using RF magnetron sputtering in pure argon plasma. BWO films deposited at 800 °C exhibit crystalline nature. Also, BWO films deposited in the temperature range of 400 - 600 °C exhibit WO3 as a secondary phase and its weight percentage decreases with an increase in deposition temperature, whereas the films deposited at 800 °C exhibited pure tetragonal phase. FESEM images revealed that as the average particle sizes of the films are higher as compared with the thickness of the films and is explained based on Avrami type nucleation and growth. The transmittance of the films decreases with an increase in deposition temperature up to 600 °C and increases thereafter. Films deposited at 600 °C show ≤ 20% transmittance, looking at the films deposited at room temperature and 800 °C exhibits 90 and 70%, respectively. The refractive index and extinction coefficient of the films show profound dependence on crystallinity and packing density. The optical bandgap of BWO films increases significantly with an increase in O2% during the deposition. The optical bandgap of the BWO films deposited at different temperatures in pure argon plasma, are in the range of 3.7 to 3.94 eV whereas the films deposited at 600 °C under different O2 plasma are in the range of 3.6 - 4.5 eV. The formations of colour centres are associated with the oxygen vacancies, which are clearly seen from the optical bandgap studies. The observed irreversible thermochromic behaviour in BWO films is attributed to the presence of oxygen vacancies that arises due to the electrons trapped at oxygen vacancies causing an inter valence charge transfer of W5+ to W6+ and is confirmed through the change in the optical density (ΔOD. Further, the Raman spectra are being used to quantify the presence of oxygen vacancies and the formation of pure BWO phase. The obtained optical responses of BWO films are promising for solar cell and smart window applications.

  12. Microstructures using RF sputtered PSG film as a sacrificial layer in ...

    Indian Academy of Sciences (India)

    These films are also used for surface passivation and improving the metal layer step coverage in device fabrication (Sze 1988; Takamatsu et al. 1984). In MEMS, PSG films have been reported to be one of the most suitable materials for sacrificial layer because of its high etch rate. Atmospheric Pressure Chemical Vapor ...

  13. Corrosion resistance and biocompatibility of zirconium oxynitride thin film growth by RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Cubillos, G. I.; Olaya, J. J.; Clavijo, D.; Alfonso, J. E. [Universidad Nacional de Colombia, Carrera 45 No. 26-85, AA 14490 Bogota D. C. (Colombia); Bethencourt, M., E-mail: jealfonsoo@unal.edu.co [Universidad de Cadiz, Centro Andaluz de Ciencia y Tecnologia Marinas, Departamento de Ciencia de los Materiales e Ingenieria Metalurgica y Quimica Inorganica, Av. Republica de Saharaui, Puerto Real, E-11510 Cadiz (Spain)

    2012-07-01

    Thin films of zirconium oxynitride were grown on common glass, silicon (100) and stainless steel 316 L substrates using the reactive RF magnetron sputtering technique. The films were analyzed through structural, morphological and biocompatibility studies. The structural analysis was carried out using X-ray diffraction (XRD), and the morphological analysis was carried out using scanning electron microscopy (Sem) and atomic force microscopy (AFM). These studies were done as a function of growth parameters, such as power applied to the target, substrate temperature, and flow ratios. The corrosion resistance studies were made on samples of stainless steel 316 L coated and uncoated with Zr{sub x}N{sub y}O films, through of polarization curves. The studies of biocompatibility were carried out on zirconium oxynitride films deposited on stainless steel 316 L through proliferation and cellular adhesion. The XRD analysis shows that films deposited at 623 K, with a flow ratio {Phi}N{sub 2}/{Phi}O{sub 2} of 1.25 and a total deposit time of 30 minutes grew preferentially oriented along the (111) plane of the zirconium oxynitride monoclinic phase. The Sem analyses showed that the films grew homogeneously, and the AFM studies indicated that the average rugosity of the film was 5.9 nm and the average particle size was 150 nm. The analysis of the corrosion resistant, shows that the stainless steel coated with the film was increased a factor 10. Finally; through the analysis of the biocompatibility we established that the films have a better surface than the substrate (stainless steel 316 L) in terms of the adhesion and proliferation of bone cells. (Author)

  14. Visible luminescence from highly textured Tb{sup 3+} doped RF sputtered zinc oxide films

    Energy Technology Data Exchange (ETDEWEB)

    Sreedharan, R. Sreeja; Krishnan, R. Reshmi; Bose, R. Jolly; Kavitha, V.S.; Suresh, S. [Department of Optoelectronics, University of Kerala, Thiruvananthapuram 695581, Kerala (India); Vinodkumar, R. [Department of Optoelectronics, University of Kerala, Thiruvananthapuram 695581, Kerala (India); Department of Physics, University College, Thiruvananthapuram, Kerala (India); Sudheer, S.K. [Department of Optoelectronics, University of Kerala, Thiruvananthapuram 695581, Kerala (India); Pillai, V.P. Mahadevan, E-mail: vpmpillai9@gmail.com [Department of Optoelectronics, University of Kerala, Thiruvananthapuram 695581, Kerala (India)

    2017-04-15

    Highly transparent, luminescent, c-axis oriented Tb{sup 3+} doped ZnO films are prepared by RF magnetron sputtering technique. The structural, morphological, optical and luminescence properties of these films are investigated as a function of Tb{sup 3+} doping concentration by X-ray diffraction (XRD), micro-Raman spectroscopy, atomic force microscopy (AFM), field emission scanning electron microscopy (FESEM), spectroscopic ellipsometry, UV-Visible spectroscopy and photoluminescence spectroscopy. The as-deposited films are found to be highly crystalline with wurtzite hexagonal phase of ZnO. The characteristic features of hexagonal wurtzite structure of ZnO, particularly the appearance of non-polar E{sub 2} modes are easily identified from the Raman spectra of the films. The surface morphology of the films revealed by FESEM and AFM images present a dense distribution of grains. The elemental analysis carried out using energy dispersive X-ray (EDX) spectra confirms the incorporation of Tb{sup 3+} ions in the ZnO lattice. The films are highly transparent in the visible region. Using ellipsometric analysis, the variation of refractive index, dielectric constant and thickness of the films are studied as a function of Tb{sup 3+} doping concentration. The photoluminescence spectra of the Tb{sup 3+} doped ZnO films recorded using an excitation radiation of wavelength 325 nm from a He-Cd laser exhibit visible luminescence ~430, 490, 516 and 542 nm. The origin of visible emissions ~490 and 542 nm in the doped films can be attributed to 5D{sub 4}→7F{sub 6} and 5D{sub 4}→7F{sub 5} transition of Tb{sup 3+} ion respectively. The intensity of the emission at 542 nm is found to be decreasing at higher doping concentration due to concentration quenching effect. The blue emission in the films can be attributed to the electron transition from shallow donor level formed by interstitial Zn atoms to the top of the valence band. The origin of the visible emission ~516 nm is attributed to antisite oxygen defects in ZnO.

  15. The effects of thermal annealing in structural and optical properties of RF sputtered amorphous silicon

    International Nuclear Information System (INIS)

    Abdul Fatah Awang Mat

    1988-01-01

    The effect of thermal annealing on structural and optical properties of amorphous silicon are studied on samples prepared by radio-frequency sputtering. The fundamental absorption edge of these films are investigated at room temperature and their respective parameters estimated. Annealing effect on optical properties is interpreted in terms of the removal of voids and a decrease of disorder. (author)

  16. Enhancement of room temperature ferromagnetic behavior of rf sputtered Ni-CeO_2 thin films

    International Nuclear Information System (INIS)

    Murugan, R.; Vijayaprasath, G.; Mahalingam, T.; Ravi, G.

    2016-01-01

    Highlights: • Ni-CeO_2 thin films deposited by using rf Magnetron sputtering with different concentrations of Ni. • Deposited thin films have single crystalline and uniform surface morphology. • Photoluminescence and micro-Raman spectra were interpreted for Ni-CeO_2 thin films. • XPS spectra confirmed Ni ions were present in the doped CeO_2 thin films. • Ni ions induced ferromagnetic behavior of Ni-CeO_2 films were confirmed through VSM. - Abstract: Ni-doped CeO_2 thin films were prepared under Ar"+ atmosphere on glass substrates using rf magnetron sputtering. To assess the properties of the prepared thin films, the influence of various amounts of Ni dopant on structural, morphological, optical, vibrational, compositional and magnetic properties of the CeO_2 films were studied by using X-Ray diffraction (XRD), atomic force microscope (AFM), photoluminescence (PL), micro-Raman, X-ray photoelectron spectroscopy (XPS) and vibrating sample magnetometer (VSM). XRD patterns for all the samples revealed the expected CeO_2 cubic fluorite-type structure and Ni ions were uniformly distributed in the samples. AFM images of the prepared samples indicate high dense, columnar structure with uniform distribution of CeO_2. Room-temperature photoluminescence (PL) and micro-Raman spectroscopic studies revealed an increase of oxygen vacancies with higher concentration of Ni in CeO_2. XPS results confirm the presence of Ni_2_p, O_1_s and Ce and depict that cerium is present as both Ce"4"+ and Ce"3"+ oxidation states in Ce_1_−_xNi_xO_2 (x = 15%) thin film. Field dependent magnetization measurements revealed a paramagnetic behavior for pure CeO_2, while a ferromagnetic behavior appeared when Ni is doped in CeO_2 films. Doping dependent magnetization measurements suggest that the observed ferromagnetism is due to the presence of metallic Ni clusters with nanometric size and broad size distribution.

  17. Highly transparent conductive ITO/Ag/ITO trilayer films deposited by RF sputtering at room temperature

    Directory of Open Access Journals (Sweden)

    Ningyu Ren

    2017-05-01

    Full Text Available ITO/Ag/ITO (IAI trilayer films were deposited on glass substrate by radio frequency magnetron sputtering at room temperature. A high optical transmittance over 94.25% at the wavelength of 550 nm and an average transmittance over the visual region of 88.04% were achieved. The calculated value of figure of merit (FOM reaches 80.9 10-3 Ω-1 for IAI films with 15-nm-thick Ag interlayer. From the morphology and structural characterization, IAI films could show an excellent correlated electric and optical performance if Ag grains interconnect with each other on the bottom ITO layer. These results indicate that IAI trilayer films, which also exhibit low surface roughness, will be well used in optoelectronic devices.

  18. Mechanical properties of TiN films deposited by changed-pressure r.f. sputtering

    International Nuclear Information System (INIS)

    Kubo, Y.; Hashimoto, M.

    1991-01-01

    TiN was deposited onto glass, stainless steel and cemented carbide by r.f. magnetron sputtering. The mechanical properties of TiN such as hardness, internal stress and adhesion were assessed by the Vickers microhardness test, the bending method and the modified scratch test. It was found that the operating pressure during sputtering deposition strongly affects these mechanical properties. As the operating pressure is increased beyond 0.6-0.7 Pa, the adhesion of TiN films onto the substrate increases enormously, but the hardness decreases owing to the release of the high compressive stress in the film. Therefore changing the pressure from high to low during deposition could be a good way of optimizing both hardness and adhesion. The effectiveness of this changed-pressure process was experimentally verified by cutting tests using TiN-coated cemented carbide tools. This process will be applicable to any other hard coating materials having high compressive stresses. (orig.)

  19. Properties of RF-Sputtered PZT Thin Films with Ti/Pt Electrodes

    Directory of Open Access Journals (Sweden)

    Cui Yan

    2014-01-01

    Full Text Available Effect of annealing temperature and thin film thickness on properties of Pb(Zr0.53Ti0.47O3 (PZT thin film deposited via radiofrequency magnetron sputtering technique onto Pt/Ti/SiO2/Si substrate was investigated. Average grain sizes of the PZT thin film were measured by atomic force microscope; their preferred orientation was studied through X-ray diffraction analysis. Average residual stress in the thin film was estimated according to the optimized Stoney formula, and impedance spectroscopy characterization was performed via an intelligent LCR measuring instrument. Average grain sizes of PZT thin films were 60 nm~90 nm and their average roughness was less than 2 nm. According to X-ray diffraction analysis, 600°C is the optimal annealing temperature to obtain the PZT thin film with better crystallization. Average residual stress showed that thermal mismatch was the decisive factor of residual stress in Pt/Ti/SiO2/Si substrate; the residual stress in PZT thin film decreased as their thickness increased and increased with annealing temperature. The dielectric constant and loss angle tangent were extremely increased with the thickness of PZT thin films. The capacitance of the device can be adjusted according to the thickness of PZT thin films.

  20. Optical properties of zinc titanate perovskite prepared by reactive RF sputtering

    Science.gov (United States)

    Müllerová, Jarmila; Šutta, Pavol; Medlín, Rostislav; Netrvalová, Marie; Novák, Petr

    2017-12-01

    In this paper we report results from optical transmittance spectroscopy complemented with data on structure from XRD measurements to determine optical properties of a series of ZnTiO3 perovskite thin films deposited on glass by reactive magnetron co-sputtering. The members of the series differ by the titanium content that was revealed as an origin of the changes not only in structure but also in dispersive optical properties. Low porosity has been discovered and calculated using the Bruggeman effective medium approximation. An apparent blue-shift of the optical band gap energies with increasing titanium content was observed. The observed band gap engineering is a good prospective for eg optoelectronic and photocatalytic applications of ZnTiO3.

  1. Polarization profile of RF-sputtered self-polarized PZT thin films

    Czech Academy of Sciences Publication Activity Database

    Suchaneck, G.; Koehler, R.; Sandner, T.; Gerlach, G.; Deineka, Alexander; Jastrabík, Lubomír; Kosarev, A. I.; Andronov, A. N.

    2001-01-01

    Roč. 32, - (2001), s. 861-869 ISSN 1058-4587 R&D Projects: GA ČR GA202/00/1425 Institutional research plan: CEZ:A02/98:Z1-010-914 Keywords : self-polarization * electrode interaction * interface layer Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 0.512, year: 2001

  2. Nitrogen dissociation during RF sputtering of Lipon electrolyte for all-solid-states batteries

    DEFF Research Database (Denmark)

    Stamate, Eugen; Christiansen, Ane Sælland; Holtappels, Peter

    2013-01-01

    Small size and high power density secondary batteries are desired for a large number of applications based on miniature wireless devices and sensors that need to be compatible with the microelectronic fabrication technology. This fact resulted in the development of solid electrolytes, like lithium...

  3. Properties of RF sputtered zinc oxide based thin films made from different targets

    Energy Technology Data Exchange (ETDEWEB)

    Martinez, M A; Herrero, J; Gutierrez, M T [Instituto de Energias Renovables, Madrid (Spain)

    1994-01-01

    The effect of deposition parameters on optoelectronic and structural properties of ZnO based thin films prepared by RF magnetron sputtering have been studied. Different targets (pure Zn, ZnO, Zn-Al (98/2 at%), ZnO-Al (98/2 at%), and ZnO-Al{sub 2}O{sub 3} (98/2 wt%)) have been investigated to compare resulting samples and establish the best target composition. From reactive sputtering, using a Zn-Al target, transparent conductive zinc oxide has been obtained at 380{sup o}C with E{sub g}=3.25-3.35 eV and {rho}=4.8x10{sup -4} {Omega}cm. Reduction of substrate temperature at 200{sup o}C has been possible by nonreactive sputtering from ZnO-Al and ZnO-Al{sub 2}O{sub 3} targets. The values of the energy gap and resistivity under these conditions are 3.30-3.35 eV and 1x10{sup -3} {Omega}cm respectively

  4. LiCoO.sub.2./sub. thin-film cathodes grown by RF sputtering

    Czech Academy of Sciences Publication Activity Database

    Prachařová, Jarmila; Přidal, Jiří; Bludská, Jana; Jakubec, Ivo; Vorlíček, Vladimír; Málková, Zuzana; Makris, D. T.; Giorgi, R.; Jastrabík, Lubomír

    2002-01-01

    Roč. 108, - (2002), s. 204-212 ISSN 0378-7753 R&D Projects: GA MŠk ME 305 Institutional research plan: CEZ:AV0Z1010914 Keywords : LiCoO 3 * thin-film cathodes * Li- ion batteries Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.777, year: 2002

  5. Visible and infrared photoluminescence from erbium-doped silicon nanocrystals produced by rf sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Cerqueira, M.F.; Alpuim, P. [Departamento de Fisica, Universidade do Minho, Braga (Portugal); Losurdo, M. [Plasma Chemistry Research Center, CNR, Bari (Italy); Monteiro, T.; Soares, M.J.; Peres, M. [Departamento de Fisica, Universidade de Aveiro, Aveiro (Portugal); Stepikova, M. [Institute for Physics of Microstructures RAS, 603600 Nizhnij Novgorod GSP-105 (Russian Federation)

    2007-06-15

    Erbium-doped low-dimensional Si films with different microstructures were deposited by reactive magnetron sputtering on glass substrates by varying the hydrogen flow rate during deposition. Amorphous, micro- and nanocrystalline samples, consisting of Si nanocrystalls embedded in silicon-based matrices with different structures, were achieved with optical properties in the visible and IR depending on nanocrystalline fraction and matrix structure and chemical composition. Structural characterization was performed by X-ray diffraction in the grazing incidence geometry and Raman spectroscopy. The chemical composition was studied using RBS/ERD techniques. Spectroscopic ellipsometry was combined with the previous techniques to further resolve the film microstructure and composition. In particular, the distribution along the film thickness of the volume fractions of nanocrystalline/amorphous silicon and SiO{sub x} phases has been obtained. In this contribution we discuss visible and infrared photoluminescence as a function of sample microstructure and of the oxygen/hydrogen concentration ratio present in the matrix. (copyright 2007 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  6. Irreversible thermochromic response of RF sputtered nanocrystalline BaWO{sub 4} films for smart window applications

    Energy Technology Data Exchange (ETDEWEB)

    Anil Kumar, C.; Santhosh Kumar, T.; Pamu, D., E-mail: pamu@iitg.ernet.in [Department of Physics, Indian Institute of Technology Guwahati, Guwahati -781039 (India)

    2015-10-15

    We report irreversible thermochromic behaviour of BaWO{sub 4} (BWO) films for the first time. BWO films have been deposited at different substrate temperatures (RT, 200, 400, 600 and 800 °C) using RF magnetron sputtering in pure argon plasma. BWO films deposited at 800 °C exhibit crystalline nature. Also, BWO films deposited in the temperature range of 400 - 600 °C exhibit WO{sub 3} as a secondary phase and its weight percentage decreases with an increase in deposition temperature, whereas the films deposited at 800 °C exhibited pure tetragonal phase. FESEM images revealed that as the average particle sizes of the films are higher as compared with the thickness of the films and is explained based on Avrami type nucleation and growth. The transmittance of the films decreases with an increase in deposition temperature up to 600 °C and increases thereafter. Films deposited at 600 °C show ≤ 20% transmittance, looking at the films deposited at room temperature and 800 °C exhibits 90 and 70%, respectively. The refractive index and extinction coefficient of the films show profound dependence on crystallinity and packing density. The optical bandgap of BWO films increases significantly with an increase in O{sub 2}% during the deposition. The optical bandgap of the BWO films deposited at different temperatures in pure argon plasma, are in the range of 3.7 to 3.94 eV whereas the films deposited at 600 °C under different O{sub 2} plasma are in the range of 3.6 - 4.5 eV. The formations of colour centres are associated with the oxygen vacancies, which are clearly seen from the optical bandgap studies. The observed irreversible thermochromic behaviour in BWO films is attributed to the presence of oxygen vacancies that arises due to the electrons trapped at oxygen vacancies causing an inter valence charge transfer of W{sup 5+} to W{sup 6+} and is confirmed through the change in the optical density (ΔOD). Further, the Raman spectra are being used to quantify the presence of oxygen vacancies and the formation of pure BWO phase. The obtained optical responses of BWO films are promising for solar cell and smart window applications.

  7. Fabrication and Characterization of CZTS Thin Films Prepared by the Sulfurization of RF-Sputtered Stacked Metal Precursors

    Science.gov (United States)

    Abusnina, Mohamed; Moutinho, Helio; Al-Jassim, Mowafak; DeHart, Clay; Matin, Mohammed

    2014-09-01

    In this work, Cu2ZnSnS4 (CZTS) thin films were prepared by the sulfurization of metal precursors deposited sequentially via radio frequency magnetron sputtering on Mo-coated soda-lime glass. The stack order of the precursors was Mo/Zn/Sn/Cu. Sputtered precursors were annealed in sulfur atmosphere with nine different conditions to study the impact of sulfurization time and substrate temperature on the structural, morphological, and optical properties of the final CZTS films. X-ray fluorescence was used to determine the elemental composition ratio of the metal precursors. Final CZTS films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), and energy-dispersive spectroscopy (EDS). XRD and EDS were combined to investigate the films' structure and to identify the presence of secondary phases. XRD analysis indicated an improvement in film crystallinity with an increase of the substrate temperature and annealing times. Also indicated was the minimization and/or elimination of secondary phases when the films experienced longer annealing time. EDS revealed slight Sn loss in films sulfurized at 550°C; however, an increase of the sulfurization temperature to 600°C did not confirm these results. SEM study showed that films treated with higher temperatures exhibited dense morphology, indicating the completion of the sulfurization process. The estimated absorption coefficient was on the order of 104 cm-1 for all CZTS films, and the values obtained for the optical bandgap energy of the films were between 1.33 eV and 1.52 eV.

  8. Applications of ZnO:Al deposited by RF sputtering to InN low-cost technology

    Energy Technology Data Exchange (ETDEWEB)

    Fernandez, S. [Departamento de Energias Renovables, Energia Solar Fotovoltaica, Centro de Investigaciones Energeticas, Medioambientales y Tecnologicas (CIEMAT), Madrid (Spain); Naranjo, F.B.; Valdueza-Felip, S. [Grupo de Ingenieria Fotonica, Departamento de Electronica, Escuela Politecnica Superior, Universidad de Alcala Campus Universitario, Madrid (Spain); Abril, O. de [ISOM y Departamento de Fisica Aplicada, Escuela Tecnica Superior de Ingenieros de Telecomunicacion, Universidad Politenica de Madrid (Spain)

    2010-07-15

    InN/ZnO:Al heterostructures deposited at low temperature on different substrates by radio-frequency sputtering were studied. Using ZnO:Al as buffer layer, an improvement in the InN structural properties was achieved. Evaluating ZnO:Al as contact on InN, an Ohmic behaviour for the as-deposited layer on InN was achieved. A specific contact resistance of 2 {omega} cm{sup 2} was measured without any post-deposition treatment. These properties could result very promising for optoelectronic device applications. (Abstract Copyright [2010], Wiley Periodicals, Inc.)

  9. Oxygen partial pressure effects on the RF sputtered p-type NiO hydrogen gas sensors

    Science.gov (United States)

    Turgut, Erdal; Çoban, Ömer; Sarıtaş, Sevda; Tüzemen, Sebahattin; Yıldırım, Muhammet; Gür, Emre

    2018-03-01

    NiO thin films were grown by Radio Frequency (RF) Magnetron Sputtering method under different oxygen partial pressures, which are 0.6 mTorr, 1.3 mTorr and 2.0 mTorr. The effects of oxygen partial pressures on the thin films were analyzed through Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), X-ray Diffraction (XRD), X-ray Photoelectron Spectroscopy (XPS) and Hall measurements. The change in the surface morphology of the thin films has been observed with the SEM and AFM measurements. While nano-pyramids have been obtained on the thin film grown at the lowest oxygen partial pressure, the spherical granules lower than 60 nm in size has been observed for the samples grown at higher oxygen partial pressures. The shift in the dominant XRD peak is realized to the lower two theta angle with increasing the oxygen partial pressures. XPS measurements showed that the Ni2p peak involves satellite peaks and two oxidation states of Ni, Ni2+ and Ni3+, have been existed together with the corresponding splitting in O1s spectrum. P-type conductivity of the grown NiO thin films are confirmed by the Hall measurements with concentrations on the order of 1013 holes/cm-3. Gas sensor measurements revealed minimum of 10% response to the 10 ppm H2 level. Enhanced responsivity of the gas sensor devices of NiO thin films is shown as the oxygen partial pressure increases.

  10. Rf-sputtered vanadium oxide thin films: effect of oxygen partial pressure on structural and electrochemical properties

    CERN Document Server

    Park, Y J; Ryu, K S; Chang, S H; Park, S C; Yoon, S M; Kim, D K

    2001-01-01

    Vanadium oxide thin films with thickness of about 2000 A have been prepared by radio frequency sputter deposition using a V sub 2 O sub 5 target in a mixed argon and oxygen atmosphere with different Ar/O sub 2 ratio ranging from 99/1 to 90/10. X-ray diffraction and X-ray absorption near edge structure spectroscopic studies show that the oxygen content higher than 5% crystallizes a stoichiometric V sub O sub 5 phase, while oxygen deficient phase is formed in the lower oxygen content. The oxygen content in the mixed Ar + O sub 2 has a significant influence on electrochemical lithium insertion/deinsertion property. The discharge-charge capacity of vanadium oxide film increases with increasing the reactive oxygen content. The V sub O sub 5 film deposited at the Ar/O sub 2 ratio of 90/10 exhibits high discharge capacity of 100 mu Ah/cm sup 2 -mu m along with good cycle performance.

  11. Tribological properties of BixTiyOz films grown via RF sputtering on 316L steel substrates

    Directory of Open Access Journals (Sweden)

    Johanna Parra

    2015-01-01

    Full Text Available En este trabajo se presentan los resultados obtenidos en el análisis químico superficial, la caracterización morfológica y evaluación de las propiedades tribológicas de recubrimientos de titanato de bismuto amorfo (BixTiyOz depositados sobre sustratos de acero inoxidable 316L utilizando la técnica de pulverización catódica rf. El análisis químico elemental se realizó por medio de espectroscopia de electrones Auger (EEA, la morfología de los recubrimientos se determinó mediante microscopia de fuerza atómica (MFA. Las medidas del coeficiente de fricción y la tasa de desgaste fueron obtenidas mediante pruebas de bola sobre disco. Los análisis de EEA permitieron establecer que los primeros 10 nm de los recubrimientos están formados probablemente por óxidos de Bi4Ti3O12 y Ti2O3, las medidas de AFM indican que los recubrimientos tienen una rugosidad promedio de 22.28nm y un tamaño de grano de 50nm. Finalmente, las pruebas tribológicas establecieron que el coeficiente de fricción y la tasa de desgaste del acero recubierto tiene valores similares al acero desnudo.

  12. Electrical and ferroelectric properties of RF sputtered PZT/SBN on silicon for non-volatile memory applications

    Science.gov (United States)

    Singh, Prashant; Jha, Rajesh Kumar; Singh, Rajat Kumar; Singh, B. R.

    2018-02-01

    We report the integration of multilayer ferroelectric film deposited by RF magnetron sputtering and explore the electrical characteristics for its application as the gate of ferroelectric field effect transistor for non-volatile memories. PZT (Pb[Zr0.35Ti0.65]O3) and SBN (SrBi2Nb2O9) ferroelectric materials were selected for the stack fabrication due to their large polarization and fatigue free properties respectively. Electrical characterization has been carried out to obtain memory window, leakage current density, PUND and endurance characteristics. Fabricated multilayer ferroelectric film capacitor structure shows large memory window of 17.73 V and leakage current density of the order 10-6 A cm-2 for the voltage sweep of -30 to +30 V. This multilayer gate stack of PZT/SBN shows promising endurance property with no degradation in the remnant polarization for the read/write iteration cycles upto 108.

  13. Chemical and microstructural characterization of rf-sputtered BaTiO{sub 3} nano-capacitors with Ni electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Reck, James N., E-mail: j.n.reck@gmail.com [Missouri University of Science and Technology, Department of Materials Science and Engineering, Rolla, MO 65409 (United States); Cortez, Rebecca [Union College, Department of Mechanical Engineering, Schenectady, NY 12308 (United States); Xie, S. [Northwestern University, Department of Materials Science and Engineering, Evanston, IL 60208 (United States); Zhang Ming; O' Keefe, Matthew; Dogan, Fatih [Missouri University of Science and Technology, Department of Materials Science and Engineering, Rolla, MO 65409 (United States)

    2012-05-15

    Chemical and microstructural evaluation techniques have been used to characterize sputter deposited 100-150 nm thick BaTiO{sub 3} nano-capacitors with 30 nm thick Ni electrodes fabricated on Si/SiO{sub 2} wafers. More than 99% of devices had resistance > 20 M{Omega}. Electrodes were found to have a roughness, R{sub a}, of about 0.66 {+-} 0.04 nm, and the BaTiO{sub 3} had a R{sub a} value of 1.3 {+-} 0.12 nm. Characterization of the BaTiO{sub 3} film chemistry with X-ray Photoelectron Spectroscopy (XPS) showed the films had excess oxygen and Ba:Ti ratios ranging from 0.78 to 1.1, depending on sputtering conditions. X-ray diffraction showed a broad peak between approximately 20 Degree-Sign and 35 Degree-Sign 2{theta}, indicating the films were either amorphous or contained grain sizes less than 5 nm. Focused ion beam images confirmed the presence of smooth, conformal films, with no visible signs of macro-defects such as pin-holes, cracks, or pores. High resolution transmission electron microscopy (TEM) and electron diffraction patterns confirmed the presence of a nearly amorphous film with limited short range order. No correlation was found between the chemical and microstructural studies with the dielectric permittivity (280-1000), loss (0.02-0.09), and/or resistivity (8.7 Multiplication-Sign 10{sup 10}-1.5 Multiplication-Sign 10{sup 12} {Omega} cm) values.

  14. Microhardness variation and related microstructure in Al-Cu alloys prepared by HF induction melting and RF sputtering

    Science.gov (United States)

    Boukhris, N.; Lallouche, S.; Debili, M. Y.; Draissia, M.

    2009-03-01

    The materials under consideration are binary aluminium-copper alloys (10 at% to 90.3 at%Cu) produced by HF melting and RF magnetron sputtering. The resulting micro structures have been observed by standard metallographic techniques, X-ray powder diffraction, scanning electron microscopy and transmission electron microscopy. Vickers microhardness of bulk Al-Cu alloys reaches a maximum of 1800 MPa at 70.16 at%Cu. An unexpected metastable θ ' phase has been observed within aluminium grain in Al-37 at%Cu. The mechanical properties of a family of homogeneous Al{1-x}Cu{x} (0 Al-Cu targets have been investigated. The as-deposited microstructures for all film compositions consisted of a mixture of the two expected face-centred-cubic (fcc) Al solid solution and tetragonal θ (Al{2}Cu) phases. The microhardness regularly increases and the grain size decreases both with copper concentration. This phenomenon of significant mechanical strengthening of aluminium by means of copper is essentially due to a combination between solid solution effects and grain size refinement. This paper reports some structural features of different Al-Cu alloys prepared by HF melting and RF magnetron on glass substrate sputtering.

  15. Synergistic effect of indium and gallium co-doping on the properties of RF sputtered ZnO thin films

    Science.gov (United States)

    Shaheera, M.; Girija, K. G.; Kaur, Manmeet; Geetha, V.; Debnath, A. K.; Karri, Malvika; Thota, Manoj Kumar; Vatsa, R. K.; Muthe, K. P.; Gadkari, S. C.

    2018-04-01

    ZnO thin films were synthesized using RF magnetron sputtering, with simultaneous incorporation of Indium (In) and Gallium (Ga). The structural, optical, chemical composition and surface morphology of the pure and co-doped (IGZO) thin films were characterized by X-Ray diffraction (XRD), UV-visible spectroscopy, Field Emission Scanning Electron Microscopy (FESEM), and Raman spectroscopy. XRD revealed that these films were oriented along c-axis with hexagonal wurtzite structure. The (002) diffraction peak in the co-doped sample was observed at 33.76° with a slight shift towards lower 2θ values as compared to pure ZnO. The surface morphology of the two thin films was observed to differ. For pure ZnO films, round grains were observed and for IGZO thin films round as well as rod type grains were observed. All thin films synthesized show excellent optical properties with more than 90% transmission in the visible region and band gap of the films is observed to decrease with co-doping. The co doping of In and Ga is therefore expected to provide a broad range optical and physical properties of ZnO thin films for a variety of optoelectronic applications.

  16. Possibility for hole doping into amorphous InGaZnO4 films prepared by RF sputtering

    International Nuclear Information System (INIS)

    Kobayashi, Kenkichiro; Kohno, Yoshiumi; Tomita, Yasumasa; Maeda, Yasuhisa; Matsushima, Shigenori

    2011-01-01

    Amorphous InGaZnO 4 (IGZO) films codoped with Al and N atoms were prepared by sputtering of targets consisting of IGZO and AlN powders in Ar + O 2 atmospheres. No hole-conductivity is seen in films deposited at 2 x 10 -3 Torr, whereas hole-conductivity is found in films deposited at 2 x 10 -2 Torr at radio frequency powers of 60-80 W in 0.3-0.6% O 2 atmospheres. The amorphous p-type IGZO film has the resistivity of 210 Wcm, hole-density of 7.5 x 10 17 cm -3 , and mobility of 0.4 cm 2 /Vs. The rectification characteristic is obtained for a device constructed from Au, amorphous p-type IGZO, and amorphous n-type IGZO. (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  17. Residual stress and bending strength of ZnO films deposited on polyimide sheet by RF sputtering system

    Energy Technology Data Exchange (ETDEWEB)

    Kusaka, Kazuya, E-mail: kusaka@tokushima-u.ac.jp [Institute of Technology and Science, Tokushima University, 2-1, Minamijosanjima, Tokushima, Tokushima 7708506 (Japan); Maruoka, Yutaka, E-mail: ymaruoka1116@gmail.com [Graduate School of Advanced Technology and Science, Tokushima University, 2-1, Minamijosanjima, Tokushima, Tokushima 7708506 (Japan); Matsue, Tatsuya, E-mail: tmatsue@mat.niihama-nct.ac.jp [Department of Environmental Materials Engineering National Institute of Technology, NIIHAMA College, 7-1, Yakumo-cho, Niihama, Ehime 7928580 (Japan)

    2016-05-15

    Zinc oxide (ZnO) films were deposited on a soft polyimide sheet substrate by radio frequency sputtering with a ZnO powder target, and the films' crystal orientations and residual stress were investigated using x-ray diffraction as a function of substrate temperature. C-axis oriented ZnO films were achieved using this ZnO powder target method. The ZnO films exhibited high compressive residual stresses between −0.7 and −1.4 GPa. Finally, the authors examined the strength of the obtained film by applying tensile bending loads. No cracks were observed on the surfaces of the ZnO films after a bending test using cylinders with diameters >25 mm. After a bending test using a cylinder with a diameter of 19 mm, large cracks were formed on the films. Therefore, the authors concluded that the tensile bending strength of the obtained films was greater than ∼420 MPa.

  18. Deuterium trapping in the carbon-silicon co-deposition layers prepared by RF sputtering in D2 atmosphere

    Science.gov (United States)

    Zhang, Hongliang; Zhang, Weiyuan; Su, Ranran; Tu, Hanjun; Shi, Liqun; Hu, Jiansheng

    2018-04-01

    Deuterated carbon-silicon layers co-deposited on graphite and silicon substrates by radio frequency magnetron sputtering in pure D2 plasma were produced to study deuterium trapping and characteristics of the C-Si layers. The C-Si co-deposited layers were examined by ion beam analysis (IBA), Raman spectroscopy (RS), infrared absorption (IR) spectroscopy, thermal desorption spectroscopy (TDS) and scanning electron microscopy (SEM). It was found that the growth rate of the C-Si co-deposition layer decreased with increasing temperature from 350 K to 800 K, the D concentration and C/Si ratios increased differently on graphite and silicon substrates. TDS shows that D desorption is mainly as D2, HD, HDO, CD4, and C2D4 and release peaks occurred at temperatures of less than 900 K. RS and IR analysis reveal that the structure of the C-Si layers became more disordered with increasing temperatures. Rounded areas of peeling with 1-2 μm diameters were observed on the surface.

  19. Studies of thin films of Ti- Zr -V as non-evaporable getter films prepared by RF sputtering

    International Nuclear Information System (INIS)

    Gupta, Nidhi; Jagannath,; Sharma, R. K.; Gadkari, S. C.; Muthe, K. P.; Mukundhan, R.; Gupta, S. K.

    2013-01-01

    Non-Evaporable Getter (NEG) films of the Ti-Zr-V prepared on stainless steel substrates by Radio Frequency sputtering. To observe its getter behavior at the lowest activation temperature, the sample is heated continuously at different temperatures (100°C, 150°C, 200°C and 250°C) for 2 hours. The changes of the surface chemical composition at different temperaturesare analyzed by using XPS and SEM (Scanning Electron Microscopy) techniques. The volume elemental composition of the film has been measured by energy dispersive X-ray spectroscopy (EDX). The in-situ XPS measurements of the activated getter films show the disappearance of the superficial oxide layer through the variation in the oxygen stoichiometry during thermal activation. Results of these studies show that the deposited films of Ti-Zr-V could be used as NEG to produce extreme high vacuum.

  20. Effect of Mg doping in the gas-sensing performance of RF-sputtered ZnO thin films

    Science.gov (United States)

    Vinoth, E.; Gowrishankar, S.; Gopalakrishnan, N.

    2018-06-01

    Thin films of Mg-free and Mg-doped (3, 10 and 20 mol%) ZnO thin films have been deposited on Si (100) substrates by RF magnetron sputtering for gas-sensing application. Preferential orientation along (002) plane with hexagonal wurtzite structure has been observed in X-ray diffraction analysis. The conductivity, resistivity, and mobility of the deposited films have been measured by Hall effect measurement. The bandgap of the films has been calculated from the UV-Vis-NIR spectroscopy. It has been found that the bandgap was increased from 3.35 to 3.91 eV with Mg content in ZnO due to the radiative recombination of excitons. The change in morphology of the grown films has been investigated by scanning electron microscope. Gas-sensing measurements have been conducted for fabricated films. The sensor response, selectivity, and stability measurement were done for the fabricated films. Though better response was found towards ethanol, methanol, and ammonia for MZ2 (Mg at 10 mol%) film and maximum gas response was observed towards ammonia. The selectivity measurement reveals maximum sensitivity about 42% for ammonia. The low response time of 123 s and recovery time of 152 s towards ammonia were observed for MZ2 (Mg at 10 mol%). Stability of the Mg-doped ZnO thin film confirmed by the continuous sensing measurements for 4 months.

  1. Magnetoelectric coupling in multiferroic heterostructure of rf-sputtered Ni–Mn–Ga thin film on PMN–PT

    International Nuclear Information System (INIS)

    Teferi, M.Y.; Amaral, V.S.; Lounrenco, A.C.; Das, S.; Amaral, J.S.; Karpinsky, D.V.; Soares, N.; Sobolev, N.A.; Kholkin, A.L.; Tavares, P.B.

    2012-01-01

    In this paper, we report a preparation of multiferroic heterostructure from thin film of Ni–Mn–Ga (NMG) alloy and lead magnesium niobate–lead titanate (PMN–PT) with effective magnetoelectric (ME) coupling between the film as ferromagnetic material and PMN–PT as piezoelectric material. The heterostructure was prepared by relatively low temperature (400 °C) deposition of the film on single crystal of piezoelectric PMN–PT substrate using rf magnetron co-sputtering of Ni 50 Mn 50 and Ni 50 Ga 50 targets. Magnetic measurements by Superconducting Quantum Interference Design (SQIUD) Magnetometer and Vibrating Sample Magnetometer (VSM) on the film revealed that the film is in ferromagnetically ordered martensitic state at room temperature with saturation magnetization of ∼240 emu/cm 3 and Curie temperature of ∼337 K. Piezoresponse force microscopy (PFM) measurement done at room temperature on the substrate showed the presence of expected hysteresis loop confirming the stability of the piezoelectric state of the substrate after deposition. Room temperature ME voltage coefficient (α ME ) of the heterostructure was measured as a function of applied bias dc magnetic field in Longitudinal–Transverse (L–T) ME coupling mode by lock-in technique. A maximum ME coefficient α ME of 3.02 mV/cm Oe was measured for multiferroic NMG/PMN–PT heterostructure which demonstrates that there is ME coupling between the film as ferromagnetic material and PMN–PT as piezoelectric material. - Highlights: ► Multiferroic NMG/PMN–PT heterostructure prepared by depositing NMG alloy thin film on PMN–PT substrate. ► The film is in ferromagnetically ordered martensite state at room temperature. ► The substrate maintains its piezoelectric state after deposition. ► The heterostructure exhibits ME effect with maximum of α ME of 3.02 mV/cm Oe.

  2. Study the target effect on the structural, surface and optical properties of TiO2 thin film fabricated by RF sputtering method

    Science.gov (United States)

    Vyas, Sumit; Tiwary, Rohit; Shubham, Kumar; Chakrabarti, P.

    2015-04-01

    The effect of target (Ti metal target and TiO2 target) on Titanium Dioxide (TiO2) thin films grown on ITO coated glass substrate by RF magnetron sputtering has been investigated. A comparative study of both the films was done in respect of crystalline structure, surface morphology and optical properties by using X-ray diffractometer (XRD), Atomic Force Microscopy (AFM) studies and ellipsometric measurements. The XRD results confirmed the crystalline structure and indicated that the deposited films have the intensities of anatase phase. The surface morphology and roughness values indicated that the film using Ti metal target has a smoother surface and densely packed with grains as compared to films obtained using TiO2 target. A high transmission in the visible region, and direct band gap of 3.67 eV and 3.75 eV for films derived by using Ti metal and TiO2 target respectively and indirect bandgap of 3.39 eV for the films derived from both the targets (Ti metal and TiO2 target) were observed by the ellipsometric measurements.

  3. Development of ZnO:Al-based transparent contacts deposited at low-temperature by RF-sputtering on InN layers

    Energy Technology Data Exchange (ETDEWEB)

    Fernandez, S. [Departamento de Energias Renovables, Energia Solar Fotovoltaica, Centro de Investigaciones Energeticas, Medioambientales y Tecnologicas (CIEMAT), Avda. Complutense 22, 28040 Madrid (Spain); Naranjo, F.B.; Valdueza-Felip, S. [Grupo de Ingenieria Fotonica, Departamento de Electronica, Escuela Politecnica Superior, Universidad de Alcala Campus Universitario, 28871 Alcala de Henares, Madrid (Spain); Abril, O. de [ISOM and Departamento de Fisica Aplicada, Escuela Tecnica Superior de Ingenieros de Telecomunicacion, Universidad Politenica de Madrid, Ciudad Universitaria s/n, 28040 Madrid (Spain)

    2012-03-15

    Nitride semiconductors (Al,Ga,In)N attain material properties that make them suitable for photovoltaic and optoelectronics devices to be used in hard environments. These properties include an energy gap continuously tuneable within the energy range of the solar spectrum, a high radiation resistance and thermal stability. The developing of efficient devices requires contacts with low resistivity and high transmittance in visible region. ZnO:Al (AZO) emerges as a feasible candidate for transparent contact to nitride semiconductors, taking advantage of its low resistivity, high transparency in visible wavelengths and a very low lattice mismatch with respect to nitride semiconductors. This work presents a study of the applications of AZO films deposited at low-temperature by RF magnetron sputtering as transparent contact for InN layers. The optimization of AZO conditions deposition lead to the obtaining of contacts which shows an ohmic behaviour for the as-deposited layer, regardless the thickness of the ZnO:Al contact layer. Specific contact resistances of 1.6 {omega}.cm{sup 2} were achieved for the contact with 90 nm thick ZnO:Al layer without any post-deposition treatment (copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  4. Fabrication and characterization of implantable and flexible nerve cuff electrodes with Pt, Ir and IrOx films deposited by RF sputtering

    International Nuclear Information System (INIS)

    Lee, Soo Hyun; Jung, Jung Hwan; Chae, Youn Mee; Kang, Ji Yoon; Suh, Jun-Kyo Francis

    2010-01-01

    This paper presents the fabrication and characterization of implantable and flexible nerve cuff electrodes for neural interfaces using the conventional BioMEMS technique. In order to fabricate a flexible nerve electrode, polyimide (PI) was chosen as the substrate material. Then, nerve electrodes were thermally re-formed in a cuff shape so as to increase the area in which the charges were transferred to the nerve. Platinum (Pt), iridium (Ir) and iridium oxide (IrO x ) films, which were to serve as conducting materials for the nerve electrodes, were deposited at different working pressures by RF magnetron sputtering. The electrochemical properties of the deposited films were characterized by electrochemical impedance spectroscopy (EIS). The charge delivery capacities of the films were recorded and calculated by cyclic voltammetry (CV). The deposited films of Pt, Ir and IrO x have strong differences in electrochemical properties, which depend on the working pressure of sputter. Each film deposited at 30 mTorr of working pressure shows the highest value of charge delivery capacity (CDC). For the IrO x films, the electrochemical properties were strongly affected by the working pressure as well as the Ar:O 2 gas ratio. The IrO x film deposited with an Ar:O 2 gas ratio of 8:1 showed the highest CDC of 59.5 mC cm −2 , which was about five times higher than that of films deposited with a 1:1 gas ratio.

  5. Impact of self-assembled monolayer assisted surface dipole modulation of PET substrate on the quality of RF-sputtered AZO film

    Energy Technology Data Exchange (ETDEWEB)

    Vo, Thieu Thi Tien [Department of Chemical Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan (China); Faculty of Chemical Engineering and Food Technology, Ba Ria-Vung Tau University, Vung Tau (Viet Nam); Mahesh, K.P.O. [Department of Chemical Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan (China); Lin, Pao-Hung [Department of Electronic and Computer Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan (China); Tai, Yian, E-mail: ytai@mail.ntust.edu.tw [Department of Chemical Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan (China)

    2017-05-01

    Highlights: • We use SAMs functionalizing the PET substrates to generate different surface dipoles. • We deposited AZO film on pristine and SAMs-modified PET substrate. • The positive dipole moment of PET surface promotes the crystallinity of AZO film. • The negative dipole moment of PET surface deteriorates the crystallinity of AZO film. • The electrical properties of AZO/PET changes upon the variation of the crystallinity. - Abstract: In this study, we fabricated the electron donating/withdrawing group functionalized organosilane self-assembled monolayers (SAMs) on transparent polyethylene terephthalate (PET) flexible substrate followed by the deposition of aluminum doped zinc oxide (AZO) using RF magnetron sputtering at room temperature. The effect of different SAMs on transparent PET substrates and AZO films were studied by contact angle (CA), X-ray photoelectron spectroscopy (XPS), Atomic force microscopy (AFM), X-ray diffraction (XRD), Field-Emission scanning electron microscope (FE-SEM), Hall measurement and UV–vis spectroscopy (UV–vis). The results presented that the surface dipole (i.e. electron-donating/withdrawing) of different SAMs functionalized PET substrates affected the quality of the AZO films which deposited on top of them. The crystallinity, the charge mobility, and the carrier concentration of the AZO improved when the film was deposited on the PET functionalized with electron donating group, which was possibly due to favored interaction between electron donating group and Al ions.

  6. Microstructure and properties of in-situ rf sputtered YBa{sub 2}Cu{sub 3}O{sub 7} thin films for microwave applications

    Energy Technology Data Exchange (ETDEWEB)

    Reagor, D.W.; Houlton, R.J.; Garzon, F.H.; Hawley, M.; Raistrick, I.D. [Los Alamos National Lab., NM (United States); Piza, M.E. [Massachusetts Inst. of Tech., Cambridge, MA (United States). Dept. of Materials Science

    1992-06-01

    The residual surface resistance of a number of films of YBa{sub 2}Cu{sub 3}O{sub 7}, prepared by off-axis sputtering onto MgO substrates, has been measured using parallel-plate resonator technique. Deposition conditions were kept constant, apart from the substrate temperature. There is no correlation between surface resistance and other important microscopic parameters, such as T{sub c} and c-axis lattice parameter. There is, however, a trend to higher R{sub s} with increasing volume fraction of in-plane misoriented material, although the correlation is not perfect. Furthermore, we have found that most of the misoriented material is localized at the film substrate interface and therefore is probably not responsible for most of the RF losses. The data suggest that at higher deposition temperatures, there is an increasing tendency for 45{degrees}-misoriented material to appear in the films, and it may be that a significant fraction of this material is present closer to the free film surface. STM qualitatively supports this conclusion.

  7. Microstructure and properties of in-situ rf sputtered YBa sub 2 Cu sub 3 O sub 7 thin films for microwave applications

    Energy Technology Data Exchange (ETDEWEB)

    Reagor, D.W.; Houlton, R.J.; Garzon, F.H.; Hawley, M.; Raistrick, I.D. (Los Alamos National Lab., NM (United States)); Piza, M.E. (Massachusetts Inst. of Tech., Cambridge, MA (United States). Dept. of Materials Science)

    1992-01-01

    The residual surface resistance of a number of films of YBa{sub 2}Cu{sub 3}O{sub 7}, prepared by off-axis sputtering onto MgO substrates, has been measured using parallel-plate resonator technique. Deposition conditions were kept constant, apart from the substrate temperature. There is no correlation between surface resistance and other important microscopic parameters, such as T{sub c} and c-axis lattice parameter. There is, however, a trend to higher R{sub s} with increasing volume fraction of in-plane misoriented material, although the correlation is not perfect. Furthermore, we have found that most of the misoriented material is localized at the film substrate interface and therefore is probably not responsible for most of the RF losses. The data suggest that at higher deposition temperatures, there is an increasing tendency for 45{degrees}-misoriented material to appear in the films, and it may be that a significant fraction of this material is present closer to the free film surface. STM qualitatively supports this conclusion.

  8. Impact of self-assembled monolayer assisted surface dipole modulation of PET substrate on the quality of RF-sputtered AZO film

    International Nuclear Information System (INIS)

    Vo, Thieu Thi Tien; Mahesh, K.P.O.; Lin, Pao-Hung; Tai, Yian

    2017-01-01

    Highlights: • We use SAMs functionalizing the PET substrates to generate different surface dipoles. • We deposited AZO film on pristine and SAMs-modified PET substrate. • The positive dipole moment of PET surface promotes the crystallinity of AZO film. • The negative dipole moment of PET surface deteriorates the crystallinity of AZO film. • The electrical properties of AZO/PET changes upon the variation of the crystallinity. - Abstract: In this study, we fabricated the electron donating/withdrawing group functionalized organosilane self-assembled monolayers (SAMs) on transparent polyethylene terephthalate (PET) flexible substrate followed by the deposition of aluminum doped zinc oxide (AZO) using RF magnetron sputtering at room temperature. The effect of different SAMs on transparent PET substrates and AZO films were studied by contact angle (CA), X-ray photoelectron spectroscopy (XPS), Atomic force microscopy (AFM), X-ray diffraction (XRD), Field-Emission scanning electron microscope (FE-SEM), Hall measurement and UV–vis spectroscopy (UV–vis). The results presented that the surface dipole (i.e. electron-donating/withdrawing) of different SAMs functionalized PET substrates affected the quality of the AZO films which deposited on top of them. The crystallinity, the charge mobility, and the carrier concentration of the AZO improved when the film was deposited on the PET functionalized with electron donating group, which was possibly due to favored interaction between electron donating group and Al ions.

  9. Effect of substrate temperature on the morphological, structural, and optical properties of RF sputtered Ge1−x Snx films on Si substrate

    International Nuclear Information System (INIS)

    Mahmodi, H; Hashim, M R

    2017-01-01

    In this study, Ge 1−x Sn x alloy films are co-sputtered on Si(100) substrates using RF magnetron sputtering at different substrate temperatures. Scanning electron micrographs, atomic force microscopy (AFM), Raman spectroscopy, and x-ray photoemission spectroscopy (XPS) are conducted to investigate the effect of substrate temperature on the structural and optical properties of grown GeSn alloy films. AFM results show that RMS surface roughness of the films increases from 1.02 to 2.30 nm when raising the substrate temperature. This increase could be due to Sn surface segregation that occurs when raising the substrate temperature. Raman spectra exhibits the lowest FWHM value and highest phonon intensity for a film sputtered at 140 °C. The spectra show that decreasing the deposition temperature to 140 °C improves the crystalline quality of the alloy films and increases nanocrystalline phase formation. The results of Raman spectra and XPS confirm Ge–Sn bond formation. The optoelectronic characteristics of fabricated metal-semiconductor-metal photodetectors on sputtered samples at room temperature (RT) and 140 °C are studied in the dark and under illumination. The sample sputtered at 140 °C performs better than the RT sputtered sample. (paper)

  10. Highly textured Sr, Nb co-doped BiFeO3 thin films grown on SrRuO3/Si substrates by rf- sputtering

    International Nuclear Information System (INIS)

    Ostos, C.; Raymond, O.; Siqueiros, J. M.; Suarez-Almodovar, N.; Bueno-Baques, D.; Mestres, L.

    2011-01-01

    In this study, (011)-highly oriented Sr, Nb co-doped BiFeO 3 (BFO) thin films were successfully grown on SrRuO 3 /Si substrates by rf-magnetron sputtering. The presence of parasite magnetic phases was ruled out based on the high resolution x-ray diffraction data. BFO films exhibited a columnar-like grain growth with rms surface roughness values of ≅5.3 nm and average grain sizes of ≅65-70 nm for samples with different thicknesses. Remanent polarization values (2P r ) of 54 μC cm -2 at room temperature were found for the BFO films with a ferroelectric behavior characteristic of an asymmetric device structure. Analysis of the leakage mechanisms for this structure in negative bias suggests Schottky injection and a dominant Poole-Frenkel trap-limited conduction at room temperature. Oxygen vacancies and Fe 3+ /Fe 2+ trap centers are consistent with the surface chemical bonding states analysis from x-ray photoelectron spectroscopy data. The (011)-BFO/SrRuO 3 /Si film structure exhibits a strong magnetic interaction at the interface between the multiferroic film and the substrate layer where an enhanced ferromagnetic response at 5 K was observed. Zero-field cooled (ZFC) and field cooled (FC) magnetization curves of this film system revealed a possible spin glass behavior at spin freezing temperatures below 30 K depending on the BFO film thickness.

  11. Influence of thermal treatment in N{sub 2} atmosphere on chemical, microstructural and optical properties of indium tin oxide and nitrogen doped indium tin oxide rf-sputtered thin films

    Energy Technology Data Exchange (ETDEWEB)

    Stroescu, H.; Anastasescu, M.; Preda, S.; Nicolescu, M.; Stoica, M. [Institute of Physical Chemistry “Ilie Murgulescu” of the Romanian Academy, Spl. Independentei 202, 060021 Bucharest (Romania); Stefan, N. [National Institute for Lasers, Plasma and Radiation Physics, Atomistilor 409, RO-77125, Bucharest-Magurele (Romania); Kampylafka, V.; Aperathitis, E. [FORTH-IESL, Crete (Greece); Modreanu, M. [Tyndall National Institute, University College Cork, Cork (Ireland); Zaharescu, M. [Institute of Physical Chemistry “Ilie Murgulescu” of the Romanian Academy, Spl. Independentei 202, 060021 Bucharest (Romania); Gartner, M., E-mail: mgartner@icf.ro [Institute of Physical Chemistry “Ilie Murgulescu” of the Romanian Academy, Spl. Independentei 202, 060021 Bucharest (Romania)

    2013-08-31

    We report the influence of the normal thermal treatment (TT) and of rapid thermal annealing (RTA) on the microstructural, optical and electrical properties of indium tin oxide (ITO) and nitrogen doped indium tin oxide (ITO:N) thin films. The TT was carried out for 1 h at 400 °C and the RTA for 1 min up to 400 °C, both in N{sub 2} atmosphere. The ITO and ITO:N films were deposited by reactive sputtering in Argon, and respectively Nitrogen plasma, on Si with (100) and (111) orientation. The present study brings data about the microstructural and optical properties of ITO thin films with thicknesses around 300–400 nm. Atomic Force Microscopy analysis showed the formation of continuous and homogeneous films, fully covered by quasi-spherical shaped particles, with higher roughness values on Si(100) as compared to Si(111). Spectroscopic ellipsometry allowed the determination of film thickness, optical band gap as well as of the dispersion curves of n and k optical constants. X-ray diffraction analysis revealed the presence of diffraction peaks corresponding to the same nominal bulk composition of ITO, but with different intensities and preferential orientation depending on the substrate, atmosphere of deposition and type of thermal treatment. - Highlights: ► Stability of the films can be monitored by experimental ellipsometric spectra. ► The refractive index of indium tin oxide film on 0.3–30 μm range is reported. ► Si(100) substrate induces rougher film surfaces than Si(111). ► Rapid thermal annealing and normal thermal treatment lead to stable conductive film. ► The samples have a higher preferential orientation after rapid thermal annealing.

  12. Effect of the cadmium chloride treatment on RF sputtered Cd{sub 0.6}Zn{sub 0.4}Te films for application in multijunction solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Shimpi, Tushar M., E-mail: mechanical.tushar@gmail.com; Kephart, Jason M.; Swanson, Drew E.; Munshi, Amit H.; Sampath, Walajabad S. [Department of Mechanical Engineering, Colorado State University, 1320 Campus Delivery, Fort Collins, Colorado 80523 (United States); Abbas, A.; Walls, John M. [CREST (Centre for Renewable Energy Systems and Technology), Loughborough University, Loughborough LE11 3TU (United Kingdom)

    2016-09-15

    Single phase Cd{sub 0.6}Zn{sub 0.4}Te (CdZnTe) films of 1 μm thickness were deposited by radio frequency planar magnetron sputter deposition on commercial soda lime glass samples coated with fluorine-doped tin oxide and cadmium sulphide (CdS). The stack was then treated with cadmium chloride (CdCl{sub 2}) at different temperatures using a constant treatment time. The effect of the CdCl{sub 2} treatment was studied using optical, materials, and electrical characterization of the samples and compared with the as-deposited CdZnTe film with the same stack configuration. The band gap deduced from Tauc plots on the as-deposited CdZnTe thin film was 1.72 eV. The deposited film had good crystalline quality with a preferred orientation along the {111} plane. After the CdCl{sub 2} treatment, the absorption edge shifted toward longer wavelength region and new peaks corresponding to cadmium telluride (CdTe) emerged in the x-ray diffraction pattern. This suggested loss of zinc after the CdCl{sub 2} treatment. The cross sectional transmission electron microscope images of the sample treated at 400 °C and the energy dispersive elemental maps revealed the absence of chlorine along the grain boundaries of CdZnTe and residual CdTe. The presence of chlorine in the CdTe devices plays a vital role in drastically improving the device performance which was not observed in CdZnTe samples treated with CdCl{sub 2}. The loss of zinc from the surface and incomplete recrystallization of the grains together with the presence of high densities of stacking faults were observed. The surface images using scanning electron microscopy showed that the morphology of the grains changed from small spherical shape to large grains formed due to the fusion of small grains with distinct grain boundaries visible at the higher CdCl{sub 2} treatment temperatures. The absence of chlorine along the grain boundaries, incomplete recrystallization and distinct grain boundaries is understood to cause the poor performance of the fabricated devices.

  13. Determination of the oxidation mechanism to Cd Te obtained by rf reactive magnetron sputtering in a plasma of Ar-N{sub 2}O; Determinacion del mecanismo de oxigenacion del CdTe obtenido por rf sputtering reactivo con magnetron en un plasma de Ar-N{sub 2}O

    Energy Technology Data Exchange (ETDEWEB)

    Caballero B, F.; Zapata N, A.; Bartolo P, P.; Castro R, R.; Zapata T, M.; Cauich, W.; Pena, J.L. [Departamento de Fisica Aplicada, Centro deInvestigacion y de Estudios Avanzados, Instituto Politecnico Nacional, Unidad Merida, Apartado postal 73, Cordemex, 97310 Merida, Yucatan (Mexico)

    1998-12-31

    In this work we did studies to determinate the oxidation site and incorporation mechanism of oxygen to Cd Te, when preparing Cd Te:O thin films by r f reactive magnetron sputtering, using a Cd Te target and a controlled plasma of Ar-N{sub 2}O. We study the influence in the oxygen content in films due to the variation of N{sub 2}O partial pressure, plasma power and substrate position. We monitored the process in situ by mass spectrometry to determinate the variation of present compounds when varying the N{sub 2}O partial pressure and plasma power. Thin films composition was determined by Auger electron spectroscopy and their structure by X-ray diffraction. We demonstrate that oxygen incorporation has place mainly in the substrate, forming an amorphous Cd Te:O film. We found that exists Cd Te oxidation without using nitrous oxide, may be due to residual atmosphere. We demonstrate that Cd Te oxidation depends on nitrous oxide partial pressure and plasma power. We found that deposition rate of Cd Te:O thin films depend on nitrous oxide interaction with Cd Te in the target and on the chamber walls. We propose a reaction mechanism to explain the oxygen incorporation to Cd Te. (Author)

  14. Vortex trapping in Pb-alloy Josephson junctions induced by strong sputtering of the base electrode

    International Nuclear Information System (INIS)

    Wada, M.; Nakano, J.; Yanagawa, F.

    1985-01-01

    It is observed that strong rf sputtering of the Pb-alloy base electrodes causes the junctions to trap magnetic vortices and thus induces Josephson current (I/sub J/) suppression. Trapping begins to occur when the rf sputtering that removes the native thermal oxide on the base electrode is carried out prior to rf plasma oxidation. Observed large I/sub J/ suppression is presumably induced by the concentration of vortices into the sputtered area upon cooling the sample below the transition temperature. This suggests a new method of the circumvention of the vortex trapping by strongly rf sputtering the areas of the electrode other than the junction areas

  15. Formation of high-Tc YBa2Cu3O(7-delta) films on Y2BaCuO5 substrate

    Science.gov (United States)

    Wang, W. N.; Lu, H. B.; Lin, W. J.; Yao, P. C.; Hsu, H. E.

    1988-07-01

    High-Tc superconducting YBa2Cu3O(7-delta) films have been successfully prepared on green Y2BaCuO5 (2115) ceramic substrate. The films have been formed by RF sputtering and screen printing with post annealing at 925 C. Regarding superconducting features, the sharp resistivity drop with Tc onset around 95 K (midpoint 84 K) and 99 K (midpoint 89 K) has been observed for RF sputtered and printed films respectively. Both films show the excellent adhesion towards the 2115 substrate. Powder X-ray diffraction profiles indicate a majority of 1237 phase with preferred orientation for RF sputtered thin film.

  16. Surface morphology, structural and electrical properties of RF ...

    Indian Academy of Sciences (India)

    5

    electrical properties of RF sputtered ITO thin films deposited onto Si(100). .... scanning electron microscopy (SEM) surface images are shown along with the cross- ..... annealing effect”, J. of Alloys and Compounds 509, (2011) 6072-6076.

  17. Sunlight-enhanced catalytic degradation over Ag–CuO ...

    Indian Academy of Sciences (India)

    2018-04-03

    Apr 3, 2018 ... nanoparticles thin films prepared by DC/RF sputtering technique .... 2.2 Characterization techniques .... Thin films surface morphologies of Ag–CuO nanoparti- ... is attributed to surface plasma resonance (SPR) as reported.

  18. Effect of oxygen intercalation on properties of sputtered CuYO 2 for ...

    Indian Academy of Sciences (India)

    Keywords. Transparent conducting oxide; RF sputtering; -type TCO. ... The positive sign of Seebeck coefficient (+274 VK-1) confirms the -type conductivity of the films. The optical bandgap of CuYO2 ... Bulletin of Materials Science | News.

  19. Fulltext PDF

    Indian Academy of Sciences (India)

    Bahinipati B K. Revenue sharing in semiconductor industry ... Microstructures using RF sputtered PSG film as a sacrificial ... free solder paste and isotropic conductive adhesives .... Sarada G L. Automatic transcription of continuous speech.

  20. Hydroxyapatite formation on biomedical Ti–Ta–Zr alloys by magnetron sputtering and electrochemical deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Hyun-Ju [Department of Dental Materials, Research Center of Nano-Interface Activation for Biomaterials, and Research Center for Oral Disease Regulation of the Aged, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Jeong, Yong-Hoon [Biomechanics and Tissue Engineering Laboratory, Division of Orthodontics, College of Dentistry, The Ohio State University, Columbus, OH (United States); Choe, Han-Cheol, E-mail: hcchoe@chosun.ac.kr [Department of Dental Materials, Research Center of Nano-Interface Activation for Biomaterials, and Research Center for Oral Disease Regulation of the Aged, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Brantley, William A. [Division of Prosthodontics and Restorative Science, College of Dentistry, The Ohio State University, Columbus, OH (United States)

    2014-12-01

    The purpose of this study was to investigate hydroxyapatite formation on Ti-25Ta-xZr titanium alloys resulting from radio-frequency magnetron sputtering and electrochemical deposition. Electrochemical deposition of hydroxyapatite (HA) was first carried out using a cyclic voltammetry (CV) method at 80 °C in 5 mM Ca (NO{sub 3}){sub 2} + 3 mM NH{sub 4}H{sub 2}PO{sub 4}. Then a physical vapor deposition (PVD) coating was obtained by a radio-frequency (RF) magnetron sputtering technique. The microstructures, phase transformations, and morphologies of the hydroxyapatite films deposited on the titanium alloys were analyzed by optical microscopy (OM), X-ray diffractometer (XRD), energy dispersive X-ray spectroscopy (EDS) and field-emission scanning electron microscopy (FE-SEM). The morphologies of electrochemically deposited HA showed plate-like shapes on the titanium alloys, and the morphologies of the RF-sputtered HA coating had the appearance droplet particles on the plate-like precipitates that had formed by electrochemical deposition. For the RF-sputtered HA coatings, the Ca/P ratio was increased, compared to that for the electrochemically deposited HA surface. Moreover, the RF-sputtered HA coating, consisting of agglomerated droplet particles on the electrochemically deposited HA surface, had better wettability compared to the bulk titanium alloy surface. - Highlights: • Hydroxyapatite (HA) was deposited on Ti–Ta–Zr alloys by radio-frequency (RF) magnetron sputtering and a cyclic voltammetry. • The morphologies of the RF-sputtered HA coating on electrochemical deposits presented plate-like shapes with a droplet particle. • The Ca/P ratio for RF-sputtered HA coatings was greater than that for electrochemical deposited HA coatings. • The RF-sputtered and electrochemical HA coatings had superior wettability compared to the electrochemically deposited coatings.

  1. Hydroxyapatite formation on biomedical Ti–Ta–Zr alloys by magnetron sputtering and electrochemical deposition

    International Nuclear Information System (INIS)

    Kim, Hyun-Ju; Jeong, Yong-Hoon; Choe, Han-Cheol; Brantley, William A.

    2014-01-01

    The purpose of this study was to investigate hydroxyapatite formation on Ti-25Ta-xZr titanium alloys resulting from radio-frequency magnetron sputtering and electrochemical deposition. Electrochemical deposition of hydroxyapatite (HA) was first carried out using a cyclic voltammetry (CV) method at 80 °C in 5 mM Ca (NO 3 ) 2 + 3 mM NH 4 H 2 PO 4 . Then a physical vapor deposition (PVD) coating was obtained by a radio-frequency (RF) magnetron sputtering technique. The microstructures, phase transformations, and morphologies of the hydroxyapatite films deposited on the titanium alloys were analyzed by optical microscopy (OM), X-ray diffractometer (XRD), energy dispersive X-ray spectroscopy (EDS) and field-emission scanning electron microscopy (FE-SEM). The morphologies of electrochemically deposited HA showed plate-like shapes on the titanium alloys, and the morphologies of the RF-sputtered HA coating had the appearance droplet particles on the plate-like precipitates that had formed by electrochemical deposition. For the RF-sputtered HA coatings, the Ca/P ratio was increased, compared to that for the electrochemically deposited HA surface. Moreover, the RF-sputtered HA coating, consisting of agglomerated droplet particles on the electrochemically deposited HA surface, had better wettability compared to the bulk titanium alloy surface. - Highlights: • Hydroxyapatite (HA) was deposited on Ti–Ta–Zr alloys by radio-frequency (RF) magnetron sputtering and a cyclic voltammetry. • The morphologies of the RF-sputtered HA coating on electrochemical deposits presented plate-like shapes with a droplet particle. • The Ca/P ratio for RF-sputtered HA coatings was greater than that for electrochemical deposited HA coatings. • The RF-sputtered and electrochemical HA coatings had superior wettability compared to the electrochemically deposited coatings

  2. Effect of Target Density on Microstructural, Electrical, and Optical Properties of Indium Tin Oxide Thin Films

    Science.gov (United States)

    Zhu, Guisheng; Zhi, Li; Yang, Huijuan; Xu, Huarui; Yu, Aibing

    2012-09-01

    In this paper, indium tin oxide (ITO) targets with different densities were used to deposit ITO thin films. The thin films were deposited from these targets at room temperature and annealed at 750°C. Microstructural, electrical, and optical properties of the as-prepared films were studied. It was found that the target density had no effect on the properties or deposition rate of radiofrequency (RF)-sputtered ITO thin films, different from the findings for direct current (DC)-sputtered films. Therefore, when using RF sputtering, the target does not require a high density and may be reused.

  3. Sunlight-enhanced catalytic degradation over Ag–CuO ...

    Indian Academy of Sciences (India)

    Herein, we report sunlight-activated photo-catalysis response of direct current radio frequency (DC/RF)-sputtered Ag–CuO nanoparticles thin films.We have adopted this approach for facile removal and easy recovery of thin filmsafter use. Ag was incorporated at 2.5 and 5.4 wt% with reference to pure CuO. Structural ...

  4. Room temperature deposition of amorphous p-type CuFeO2 and ...

    Indian Academy of Sciences (India)

    fabrication of CuFeO2/n-Si heterojunction by RF sputtering method. TAO ZHU1 ... Transparent conducting amorphous p-type CuFeO2 (CFO) thin film was prepared by radio-frequency ... Delafossite oxides CuMO2 (M is trivalent cation, such as.

  5. Sadhana | Indian Academy of Sciences

    Indian Academy of Sciences (India)

    Home; Journals; Sadhana. Ravindra Singh. Articles written in Sadhana. Volume 34 Issue 4 August 2009 pp 543-556. RF sputtering: A viable tool for MEMS fabrication · Sudhir Chandra Vivekanand Bhatt Ravindra Singh · More Details Abstract Fulltext PDF. Fabrication of Micro-Electro-Mechanical-Systems (MEMS) requires ...

  6. Analytical approximate equations for the resistivity and its temperature coefficient in thin polycrystalline metallic films

    International Nuclear Information System (INIS)

    Tellier, C.R.; Tosser, A.J.

    1977-01-01

    In the usual thickness range of sputtered metallic films, analytical linearized approximate expressions of polycrystalline film resistivity and its t.c.r. are deduced from the Mayadas-Shatzkes theoretical equations. A good experimental fit is observed for Al rf sputtered metal films. (orig.) [de

  7. Effect of annealing on properties of gallium-nitrogen Co-doped zinc oxide thin films prepared by sputtering and ion implantation

    International Nuclear Information System (INIS)

    Flickyngerova, S.; Vojs, M.; Novotny, I.; Tvarozek, V.; Shtereva, K. S.; Sutta, P.; Vincze, A.; Milosavlevic, M.; Jeynes, Ch.; Peng, N.

    2012-01-01

    In this paper we report an influence of post-implantation annealing (in O 2 and N 2 up to 600 grad C) on electrical and structural properties of RF sputtered ZnO:Ga thin films implanted by double energy (40 keV and 80 keV) N + ions. (authors)

  8. Bulletin of Materials Science | Indian Academy of Sciences

    Indian Academy of Sciences (India)

    Three methods including sol–gel, rf sputtering and pulsed laser deposition (PLD) have been used for the fabrication of high coercivity Co-ferrite thin films with a nanocrystalline structure. The PLD method is demonstrated to be a possible tool to achieve Co-ferrite films with high coercivity and small grain size at low ...

  9. The Influence of Chemical Alloying on the High Temperature Wear Resistance of H-Free DLC Coatings

    NARCIS (Netherlands)

    Galvan, D.; Pei, Y.T.; Hosson, J.T.M. De; Cavaleiro, A.; Chandra, T; Tsuzaki, K; Militzer, M; Ravindran, C

    2007-01-01

    A commercial RF-sputtering deposition rig was employed to deposit H-free diamond-like carbon (DLC) coatings. The influence of alloying elements such as Ti and Si on the structure, mechanical and tribological properties of the coatings was investigated. The coating was observed in cross section and

  10. Electrical and optical properties of silicon-doped gallium nitride

    Indian Academy of Sciences (India)

    Si-doped GaN films in polycrystalline form were deposited on quartz substrates at deposition temperatures ranging from 300–623 K using r.f. sputtering technique. Electrical, optical and microstructural properties were studied for these films. It was observed that films deposited at room temperature contained mainly ...

  11. Properties of lift-off structured high Tc microbridges

    NARCIS (Netherlands)

    Hauser, B.; Klopman, B.; Blank, David H.A.; Rogalla, Horst

    1989-01-01

    Microbridges and DC SQUIDs (superconducting quantum interference devices) were fabricated, using a lift-off technique, from RF sputtered YBaCuO films on MgO single-crystal substrates. Microwave measurements at 9 GHz on microbridges and the magnetic-field dependence of their critical current reveal

  12. Band alignment and defects of the diamond zinc oxide heterojunction; Bandstruktur und Defekte der Diamant-Zinkoxid-Heterostruktur

    Energy Technology Data Exchange (ETDEWEB)

    Geithner, Peter

    2008-09-12

    Zinc oxide films were grown on diamond single crystals by rf sputtering of zinc oxide. The valence and conduction band offset was determined by photoelectron spectroscopy. A deep defect occurring in the zinc oxide films on diamond was characterized by cathodoluminescence spectroscopy. (orig.)

  13. Amorphous silicon/crystalline silicon heterojunctions for nuclear radiation detector applications

    International Nuclear Information System (INIS)

    Walton, J.T.; Hong, W.S.; Luke, P.N.; Wang, N.W.; Ziemba, F.P.

    1996-10-01

    Results on characterization of electrical properties of amorphous Si films for the 3 different growth methods (RF sputtering, PECVD [plasma enhanced], LPCVD [low pressure]) are reported. Performance of these a-Si films as heterojunctions on high resistivity p-type and n- type crystalline Si is examined by measuring the noise, leakage current, and the alpha particle response of 5mm dia detector structures. It is demonstrated that heterojunction detectors formed by RF sputtered films and PECVD films are comparable in performance with conventional surface barrier detectors. Results indicate that the a-Si/c-Si heterojunctions have the potential to greatly simplify detector fabrication. Directions for future avenues of nuclear particle detector development are indicated

  14. Amorphous silicon/crystalline silicon heterojunctions for nuclear radiation detector applications

    International Nuclear Information System (INIS)

    Walton, J.T.; Hong, W.S.; Luke, P.N.; Wang, N.W.; Ziemba, F.P.

    1996-01-01

    Results on the characterization of the electrical properties of amorphous silicon films for the three different growth methods, RF sputtering, PECVD, and LPCVD are reported. The performance of these a-Si films as heterojunctions on high resistivity p-type and n-type crystalline silicon is examined by measuring the noise, leakage current and the alpha particle response of 5 mm diameter detector structures. It is demonstrated that heterojunction detectors formed by RF sputtered films and PECVD films are comparable in performance with conventional surface barrier detectors. The results indicate that the a-Si/c-Si heterojunctions have the potential to greatly simplify detector fabrication. Directions for future avenues of nuclear particle detector development are indicated

  15. Effect of Different Post Deposition Annealing Treatments on Properties of Zinc Oxide Thin Films

    Directory of Open Access Journals (Sweden)

    Arti Arora

    2010-06-01

    Full Text Available Two different post deposition annealing atmospheres of oxygen and forming gas have been investigated for the improvement of rf sputtered zinc oxide thin films. The results show that type of atmosphere (oxidant o reduction plays an important role in the changes observed in structural, electrical and optical properties. It has been found that the structural properties of rf sputtered zinc oxide films improve in all the annealing environments. The intensity and grain size increases as the annealing temperature increases. It has been found that films become stress free at lowest temperature in oxygen as compare to forming gas annealing. The zinc oxide films annealed in oxygen shows sufficient resistivity associated to high transmittance (83 % characteristics required for MEMS based acoustic devices.

  16. Silver-nickel oxide core-shell nanoparticle array electrode with enhanced lithium-storage performance

    International Nuclear Information System (INIS)

    Zhao, Wenjia; Du, Ning; Zhang, Hui; Yang, Deren

    2015-01-01

    We demonstrate the synthesis of Ag-NiO core-shell nanoparticle arrays via a one-step solution-immersion process and subsequent RF-sputtering technique. The Ag nanoparticle arrays on copper substrate are firstly prepared by a displacement reaction at mild temperature of 303K. Then, a NiO layer is deposited onto the surface of the Ag nanoparticles via RF-sputtering technique. When evaluated as an anode for lithium-ion batteries, the Ag-NiO core-shell electrode shows higher capacity and better cycling performance than the planar NiO electrode. The in-situ synthesized Ag nanoparticles can enhance the interfacial strength between the active material and substrate, andimprove the electrical conductivity of the electrode, which may be responsible for the enhanced performance

  17. Electrical resistivity of amorphous Fesub(1-x) Bsub(x) alloys

    International Nuclear Information System (INIS)

    Paja, A.; Stobiecki, T.

    1984-07-01

    The concentration dependence of the electrical resistivity of amorphous Fesub(1-x) Bsub(x) alloys has been studied over a broad composition range. The measurements for RF sputtered films made in the liquid helium temperature have been analyzed in the framework of the diffraction model. The calculated results are in good agreement with the experimental data in the range of concentration 0.12< x <0.37 where samples are amorphous and have a metallic character. (author)

  18. Radio frequency plasma excitation

    International Nuclear Information System (INIS)

    Burden, M.St.J.; Cross, K.B.

    1979-01-01

    An investigation into the use of rf sputtering for ion cleaning of insulating substrates before ion plating is reported. Initial experiments consisted of sputtering metals with rf power followed by the deposition of copper onto glass slides using rf plasma excitation and biasing supply. It was found that good quality films were obtained by rf ion plating onto plastics with excellent adhesion over a wide operating pressure range. A block schematic of the rf plasma excitation system is shown. (UK)

  19. Characteristics of Ti films for transition-edge sensor microcalorimeters

    International Nuclear Information System (INIS)

    Ukibe, M.; Koyanagi, M.; Ohkubo, M.; Pressler, H.; Kobayashi, N.

    1999-01-01

    We are developing X-ray microcalorimeters using superconducting transition-edge sensors (TESs), which can be operated at relatively high base temperatures of a 3 He cryostat. For this purpose, we have selected Ti films to be used as TESs. The Ti films were deposited on different substrates by RF-sputtering. It was found that the superconducting properties of the Ti films depended on Ar pressure, film thickness, and substrate surface roughness

  20. Characteristics of Ti films for transition-edge sensor microcalorimeters

    CERN Document Server

    Ukibe, M; Ohkubo, M; Pressler, H; Kobayashi, N

    1999-01-01

    We are developing X-ray microcalorimeters using superconducting transition-edge sensors (TESs), which can be operated at relatively high base temperatures of a sup 3 He cryostat. For this purpose, we have selected Ti films to be used as TESs. The Ti films were deposited on different substrates by RF-sputtering. It was found that the superconducting properties of the Ti films depended on Ar pressure, film thickness, and substrate surface roughness.

  1. Optimal series-parallel connection method of dye-sensitized solar cell for Pt thin film deposition using a radio frequency sputter system

    Energy Technology Data Exchange (ETDEWEB)

    Choi, Jin-Young; Hong, Ji-Tae; Seo, Hyunwoong; Kim, Mijeong; Son, Min-Kyu; Lee, Kyoung-Jun [Department of Electrical Engineering, Pusan National University Jangjeon-dong, Geumjeong-gu, Busan 609-735 (Korea, Republic of); Lee, Dong-Yoon [Advanced Materials and Application research Laboratory, Korea Electrotechnology Research Institute, 28-1, Seongju-dong, Changwon-city, Kyongnam, 641-120 (Korea, Republic of); Kim, Hee-Je [Department of Electrical Engineering, Pusan National University Jangjeon-dong, Geumjeong-gu, Busan 609-735 (Korea, Republic of)], E-mail: heeje@pusan.ac.kr

    2008-11-28

    The counter electrode widely used in DSC (Dye-sensitized solar cells) is constructed of a conducting glass substrate coated with a Pt film, in which the platinum acts as a catalyst. The characteristics of the platinum electrode depend strongly on the fabrication process and the electrode's surface condition. In this study, Pt counter electrodes were deposited by radio frequency (RF) sputtering with 6.7 x 10{sup -1} Pa Ar, RF power of 120 W and substrate temperature of 100 deg. C . The surface morphology of Pt electrodes was investigated using field emission scanning electron microscopy and atomic force microscopy. Comparison of samples prepared by RF sputtering and RF magnetron sputtering showed that the surface of the RF sputter deposited electrode had a larger surface area resulting in more effective catalytic characteristics. Finally, an open voltage of 4.8 V, a short circuit current of 569 mA and a photoelectric conversion efficiency of approximately 3.6% were achieved for cells composed of 30 DSC units of 6 cm x 4 cm DSC units with 6 cells in series and 5 cells in parallel.

  2. Properties of ZnO/CuInSe/sub 2/ heterojunctions

    International Nuclear Information System (INIS)

    Qiu, C.X.; Shih, I.

    1986-01-01

    Low resistivity thin films of ZnO have been prepared by an rf sputtering technique with a target containing indium. It was found that the electrical resistivity of the deposited ZnO films was dependent on the indium content in the films. The deposition method was used to form ZnO/CuInSe/sub 2/ heterojunctions on Bridgman-grown monocrystalline CuInSe/sub 2/ samples. Electrical properties of the heterojunctions have been investigated. Spectral photovoltage variation was also measured

  3. Discovery of an internal-friction peak in the metallic glass Nb3Ge

    International Nuclear Information System (INIS)

    Berry, B.S.; Pritchet, W.C.; Tsuei, C.C.

    1978-01-01

    A well-defined internal-friction peak has been observed near 260 K in amorphous rf-sputtered films of Nb 3 Ge, studied at audio frequencies by a vibrating-reed technique. The characteristics of the peak are consistent with a stress-induced ordering mechanism involving a presently unidentified center which undergoes reorientation by an atomic jump with a sharply defined activation energy of 0.52 eV. The peak appears to be the first example of its type found in a metallic glass

  4. Synthesis and characterization of oxidic semiconductor alloys; Synthese und Charakterisierung oxidischer Halbleiterlegierungen

    Energy Technology Data Exchange (ETDEWEB)

    Merita, S.

    2007-02-15

    In the present thesis the possibility for the synthesis of the mixed systems ZnO{sub 1-x}Te{sub x} and Cu{sub 2}O{sub 1-x}S{sub x} by means of reactive RF sputtering deposition is studied. The layers deposed on glass, sapphire, and GaN substrateswere analyzed by X-ray diffraction, optical transmission and reflection measurements, energy-dispersive X-ray analysis, secondary-ion mass spectroscopy, Hall measurements, X-ray reflectometry, scanning electron and scanning force microscopy.

  5. Redistribution of dopant and impurity concentrations during the formation of uniform WSi2 films by RTP

    International Nuclear Information System (INIS)

    Siegal, M.P.; Santiago, J.J.

    1988-01-01

    Secondary ion mass spectroscopy has been used to study the effects of rapid thermal processing on the formation of tetragonal tungsten disilicide thin films on Si(100), p-type 5 Ω . cm wafers. The substrates were chemically etched, followed by an RF sputter deposition of 710A W metal. The samples were then fast radiatively processed in an RTP system for time intervals ranging from 15 to 45 seconds at high temperature (--1100 0 C) under high vacuum. The redistribution of the boron dopant concentration profile is described in this paper

  6. Reactive sputter deposition of boron nitride

    International Nuclear Information System (INIS)

    Jankowski, A.F.; Hayes, J.P.; McKernan, M.A.; Makowiecki, D.M.

    1995-10-01

    The preparation of fully dense, boron targets for use in planar magnetron sources has lead to the synthesis of Boron Nitride (BN) films by reactive rf sputtering. The deposition parameters of gas pressure, flow and composition are varied along with substrate temperature and applied bias. The films are characterized for composition using Auger electron spectroscopy, for chemical bonding using Raman spectroscopy and for crystalline structure using transmission electron microscopy. The deposition conditions are established which lead to the growth of crystalline BN phases. In particular, the growth of an adherent cubic BN coating requires 400--500 C substrate heating and an applied -300 V dc bias

  7. Engineering the microstructure and magnetism of La2CoMnO6−δ thin films by tailoring oxygen stoichiometry

    International Nuclear Information System (INIS)

    Galceran, R.; Frontera, C.; Balcells, Ll.; Cisneros-Fernández, J.; López-Mir, L.; Bozzo, B.; Pomar, A.; Sandiumenge, F.; Martínez, B.; Roqueta, J.; Santiso, J.; Bagués, N.

    2014-01-01

    We report on the magnetic and structural properties of ferromagnetic-insulating La 2 CoMnO 6−δ thin films grown on top of (001) SrTiO 3 substrates by means of RF sputtering technique. Careful structural analysis, by using synchrotron X-ray diffraction, allows identifying two different crystallographic orientations that are closely related to oxygen stoichiometry and to the features (coercive fields and remanence) of the hysteresis loops. Both Curie temperature and magnetic hysteresis turn out to be dependent on the oxygen stoichiometry. In situ annealing conditions allow tailoring the oxygen content of the films, therefore controlling their microstructure and magnetic properties

  8. Radio frequency sputtering equipment: design considerations for the disc and annulus system

    International Nuclear Information System (INIS)

    Usher, D.M.; Cox, G.A.

    1981-01-01

    The basic equations important in the design of rf sputtering equipment are presented. Attention is restricted to the 'disc and annulus' system and simple techniques in lead-through fabrication and electrode shielding are described. Also rf power oscillator theory is used to derive the important parameters of power generation. Load coupling and power matching techniques are discussed. Problems of the magnetic field coil design are analysed and a value for the thermal conductivity of coils wound from polyurethane coated wire is given, namely k = 0.64 W m -1 / 0 C -1 , permitting the steady state temperature distribution inside such coils to be predicted. (author)

  9. Fractal formation of a Y-Ba-Cu-O thin film on SrTiO3

    International Nuclear Information System (INIS)

    Chow, L.; Chen, J.; Desai, V.; Sundaram, K.; Arora, S.

    1989-01-01

    Fractal formation has been observed after thermal annealing of the rf-sputtered Y-Ba-Cu-O thin film on SrTiO 3 substrate. Through energy-dispersive x-ray analysis, it was found that the composition of the fractal was YBa 2 Cu 3 O x and the surrounding film composition wasY 2 Ba 2 Cu 3 O x . The fractal dimensions D ranging from 1.26 to 1.65 were obtained using the standard sandbox method with different thresholds

  10. Magnetic properties of Cobalt thin films deposited on soft organic layers

    Energy Technology Data Exchange (ETDEWEB)

    Bergenti, I. [ISMN-CNR via P. Gobetti 101, Bologna 40129 (Italy)]. E-mail: i.bergenti@bo.ismn.cnr.it; Riminucci, A. [ISMN-CNR via P. Gobetti 101, Bologna 40129 (Italy); Arisi, E. [ISMN-CNR via P. Gobetti 101, Bologna 40129 (Italy); Murgia, M. [ISMN-CNR via P. Gobetti 101, Bologna 40129 (Italy); Cavallini, M. [ISMN-CNR via P. Gobetti 101, Bologna 40129 (Italy); Solzi, M. [Dipartimento di Fisica dell' Universita di Parma and CNISM, Parco Area delle Scienze 7/A, Parma 43100 (Italy); Casoli, F. [IMEM-CNR Parco Area delle Scienze 37/A, Parma 43100 (Italy); Dediu, V. [ISMN-CNR via P. Gobetti 101, Bologna 40129 (Italy)

    2007-09-15

    Magnetic and morphological properties of Cobalt thin films grown by RF sputtering on organic Alq3 layers were investigated by magneto-optical Kerr effect (MOKE) technique and atomic force microscopy (AFM). The AFM images indicate a template growth of Co layers on top of Alq3, the magnetic film 'decorates' the surface of organic material. This peculiar morphology induces a strong uniaxial magnetic anisotropy in the Co films, as detected by MOKE measurements. Results are important for the operation of a new class of devices-vertical organic spin valves.

  11. Properties of MoO3 thin film polymorphs

    International Nuclear Information System (INIS)

    McCarron, E.M.; Carcia, P.F.

    1987-01-01

    Thin film polymorphs of molybdenum trioxide have been synthesized by RF sputtering. Films deposited on thermally floating substrates are polycrystalline and exhibit preferred orientation. Depending upon the oxygen partial pressure maintained during sputtering, the films can be made to crystallize in either the thermodynamically stable orthorhombic α MoO 3 form (unique 2D-layered structure) or the metastable monoclinic β MoO 3 phase (3D ReO 3 -related structure). Metastable β films can be converted thermally to the α phase and the transformation appears topotactic. Films deposited on the cooled substrates are amorphous. A correlation between the particular phase formed and adatom mobility is noted

  12. Intrinsic ZnO films fabricated by DC sputtering from oxygen-deficient targets for Cu(In,Ga)Se2 solar cell application

    Institute of Scientific and Technical Information of China (English)

    Chongyin Yang; DongyunWan; Zhou Wang; Fuqiang Huang

    2011-01-01

    Intrinsic zinc oxide films, normally deposited by radio frequency (RF) sputtering, are fabricated by direct current (DC) sputtering. The oxygen-deficient targets are prepared via a newly developed double crucible method. The 800-nm-thick film obtaines significantly higher carrier mobility compareing with that of the 800-nm-thick ZnO film. This is achieved by the widely used RF sputtering, which favors the prevention of carrier recombination at the interfaces and reduction of the series resistance of solar cells. The optimal ZnO film is used in a Cu (In, Ga) Se2 (CIGS) solar cell with a high efficiency of 11.57%. This letter demonstrates that the insulating ZnO films can be deposited by DC sputtering from oxygen-deficient ZnO targets to lower the cost of thin film solar cells.%Intrinsic zinc oxide films,normally deposited by radio frequency (RF) sputtering,are fabricated by direct current (DC) sputtering.The oxygen-deficient targets are prepared via a newly developed double crucible method.The 800-nm-thick film obtaines significantly higher carrier mobility compareing with that of the 800-nm-thick ZnO film.This is achieved by the widely used RF sputtering,which favors the prevention of carrier recombination at the interfaces and reduction of the series resistance of solar cells.The optimal ZnO film is used in a Cu (In,Ga) Se2 (C1GS) solar cell with a high efficiency of 11.57%.This letter demonstrates that the insulating ZnO films can be deposited by DC sputtering from oxygen-deficient ZnO targets to lower the cost of thin film solar cells.High resistance transparent intrinsic zinc oxide (i-ZnO)thin film has been widely nsed as the front electrode in transparent electronics and photovoltaic devices because of its low cost and nontoxicity.Owing to its unique characteristics of high transparency and adjustable resistivity in a certain range,the use of i-ZnO thin films as diffusion barrier layers of a-Si/μc-Si,CdTe,and CIGS thin-film solar cells has been advantageous

  13. Impurities in chromium deposits produced by electroplating and physical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Dini, J.W.

    1994-05-01

    Impurity contents in electrodeposited (hexavalent and trivalent) chromium deposits and physically vapor deposited (thermal evaporation, electron beam evaporation and rf-sputtering) were compared. Oxygen is the key impurity obtained in electrodeposited films but it can be minimized in hexavalent plating solutions by operating at high temperature, e. g., 85 C. Electrodeposits produced in trivalent chromium plating solutions and physically vapor deposited films have much higher oxygen contents than electrodeposits produced in hexavalent chromium solutions operated at temperatures around 85 C. Depending on the target material used for physically vapor deposited films, these films can also have high amounts of other impurities.

  14. Nd:Ta2O5 rib waveguide lasers

    International Nuclear Information System (INIS)

    Unal, Bayram; Tai, C.-Y.; Shepherd, David P.; Wilkinson, James S.; Perney, Nicolas M.B.; Netti, M. Caterina; Parker, Gregory J.

    2005-01-01

    Ta 2 O 5 waveguides offer great potential for high-density active photonic crystal circuits and their combination with rare-earth dopants for active devices is of interest for increasing their potential functionality. To this end, neodymium-doped Ta 2 O 5 rib waveguide lasers have been fabricated on an oxidized silicon wafer by rf sputtering and argon ion-beam milling and laser action in this material has been demonstrated. Lasing was observed at wavelenghts between 1060 and 1080 nm and an absorbed pump power threshold of 87 mW was obtained

  15. Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects of microstructure and chemical composition

    Energy Technology Data Exchange (ETDEWEB)

    Cerqueira, M.F., E-mail: fcerqueira@fisica.uminho.p [Departamento de Fisica, Universidade do Minho, Campus de Gualtar 4710-057 Braga (Portugal); Losurdo, M. [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, Via Orabona n.4-70126 Bari (Italy); Stepikhova, M. [Institute for Physics of Microstructures RAS, 603600 Nizhnij Novgorod GSP-105 (Russian Federation); Alpuim, P.; Andres, G. [Departamento de Fisica, Universidade do Minho, Campus de Gualtar 4710-057 Braga (Portugal); Kozanecki, A. [Polish Academy of Sciences, Institute of Physics, PL-02668, Warsaw (Poland); Soares, M.J.; Peres, M. [Departamento de Fisica, Universidade de Aveiro, Campus de Santiago, 3700 Aveiro (Portugal)

    2009-08-31

    Erbium doped nanocrystalline silicon (nc-Si:Er) thin films were produced by reactive magnetron rf sputtering and by Er ion implantation into chemical vapor deposited Si films. The structure and chemical composition of films obtained by the two approaches were studied by micro-Raman scattering, spectroscopic ellipsometry and Rutherford backscattering techniques. Variation of deposition parameters was used to deposit films with different crystalline fraction and crystallite size. Photoluminescence measurements revealed a correlation between film microstructure and the Er{sup 3+} photoluminescence efficiency.

  16. 120 MeV Ag ion induced effects in Au/HfO2/Si MOSCAPs

    Science.gov (United States)

    Manikanthababu, N.; Prajna, K.; Pathak, A. P.; Rao, S. V. S. Nageswara

    2018-05-01

    HfO2/Si thinfilms were deposited by RF sputtering technique. 120 MeV Ag ion irradiation has been used to study the electrical properties of Au/HfO2/Si MOSCAPs. SHI (120 MeV Ag) induced annealing, defects creation and intermixing effects on the electrical properties of these systems have been studied. Here, we have observed that the high electronic excitation can cause a significant reduction of leakage currents in these MOSCAP devices. Various quantum mechanical tunneling phenomenon has been observed from the I-V characteristics.

  17. Exponential temperature dependence of the critical transport current in Y-Ba-Cu-O thin films

    International Nuclear Information System (INIS)

    Yom, S.S.; Hahn, T.S.; Kim, Y.H.; Chu, H.; Choi, S.S.

    1989-01-01

    We have measured the critical currents in rf-sputtered YBa 2 Cu 3 O/sub 7-x/ thin films deposited on polycrystalline yttria-stabilized zirconia substrates as a function of temperature down to 10 K. The dependence of the granular films at low temperature indicated exponential behavior which is similar to the superconductor-normal metal-superconductor (S-N-S) type tunneling junctions. For the films with a grain size of approximately 1 μm, we observed two exponential decay constants, which suggest that Josephson junctions limiting the transport critical current are possible both at the grain boundaries and at twin boundaries

  18. Effect of crystallographic orientation on the anodic formation of nanoscale pores/tubes in TiO 2 films

    Science.gov (United States)

    Kalantar-zadeh, K.; Sadek, A. Z.; Zheng, H.; Partridge, J. G.; McCulloch, D. G.; Li, Y. X.; Yu, X. F.; Wlodarski, W.

    2009-10-01

    Self-organized nanopores and nanotubes have been produced in thin films of titanium (Ti) prepared using filtered cathodic vacuum arc (FCVA), DC- and RF-sputter deposition systems. The anodization process was performed using a neutral electrolyte containing fluoride ions with an applied potential between 2 and 20 V (for clarity the results are only presented for 5 V). Scanning electron microscopy (SEM), atomic force microscopy (AFM) and X-ray diffraction (XRD) techniques were used to characterise the films. It was found that the crystallographic orientation of the Ti films played a significant role in determining whether pores or tubes were formed during the anodic etching process.

  19. Influences of the RF power ratio on the optical and electrical properties of GZO thin films by DC coupled RF magnetron sputtering at room temperature

    Energy Technology Data Exchange (ETDEWEB)

    Peng, Shou [State Key Laboratory of Advanced Technology for Float Glass, Bengbu 233018 (China); Bengbu Design & Research Institute for Glass Industry, Bengbu 233018 (China); Yao, Tingting, E-mail: yaott0815@163.com [State Key Laboratory of Advanced Technology for Float Glass, Bengbu 233018 (China); Bengbu Design & Research Institute for Glass Industry, Bengbu 233018 (China); Yang, Yong; Zhang, Kuanxiang; Jiang, Jiwen; Jin, Kewu; Li, Gang; Cao, Xin; Xu, Genbao; Wang, Yun [State Key Laboratory of Advanced Technology for Float Glass, Bengbu 233018 (China); Bengbu Design & Research Institute for Glass Industry, Bengbu 233018 (China)

    2016-12-15

    Ga-doped zinc oxide (GZO) thin films were deposited by closed field unbalanced DC coupled RF magnetron sputtering system at room temperature. The RF sputtering power ratio was adjusted from 0% to 100%. The crystal structure, surface morphology, transmittance and electrical resistivity of GZO films mainly influenced by RF sputtering power ratio were investigated by X-ray diffractometer, scanning electronic microscope, ultraviolet-visible spectrophotometer and Hall effect measurement. The research results indicate that the increasing RF power ratio can effectively reduce the discharge voltage of system and increase the ionizing rate of particles. Meanwhile, the higher RF power ratio can increase the carrier mobility in GZO thin film and improve the optical and electrical properties of GZO thin film significantly. Within the optimal discharge voltage window, the film deposits at 80% RF power ratio exhibits the lowest resistivity of 2.6×10{sup −4} Ω cm. We obtain the GZO film with the best average optical transmittance is approximately 84% in the visible wavelength. With the increasing RF power ratio, the densification of GZO film is enhanced. The densification of GZO film is decrease when the RF power ratio is 100%.

  20. Microstructure and mechanical properties of Zr-Si-N films prepared by rf-reactive sputtering

    CERN Document Server

    Nose, M; Zhou, M; Mae, T; Meshii, M

    2002-01-01

    ZrN and ZrSiN films were prepared in an rf sputtering apparatus that has a pair of targets facing each other (referred to as the facing target--type rf sputtering). Films were deposited on silicon wafers without bias application or substrate heating in order to examine only the effect of silicon addition to the transition metal nitride films. The contents of zirconium, nitrogen, and silicon of the films were determined with an electron probe microanalyzer. The transmission electron microscopy studies were carried out in addition to x-ray diffraction. For the high resolution transmission electron microscopy observation, the field emission type transmission electron microscope was used, which provides a point-to-point resolution of 0.1 nm. The samples were observed both parallel and perpendicular to the film surface, which were plane and cross sectional views, respectively. In order to investigate the relationship between the mechanical properties and microstructure of films, the hardness was measured by a nano...

  1. Highly stable bilayer of LiPON and B2O3 added Li1.5Al0.5Ge1.5(PO4) solid electrolytes for non-aqueous rechargeable Li-O2 batteries

    International Nuclear Information System (INIS)

    Jadhav, Harsharaj S.; Kalubarme, Ramchandra S.; Jadhav, Arvind H.; Seo, Jeong Gil

    2016-01-01

    Highlights: • LiPON thin film deposited by RF-sputtering technique. • The effect of deposition temperature on ionic conductivity was investigated. • The LiPON/B-LAGP composite was successfully employed in Li-O 2 battery. • LiPON interlayer enhances stability of B-LAGP in contact with Li-metal. - Abstract: Lithium ion conducting membranes are barely studied, although they are essentially indispensable for building Li-air batteries composed of aqueous and non-aqueous electrolytes for long-term operation. Lithium phosphorous oxynitride (LiPON) thin films were deposited by RF-sputtering technique on B 2 O 3 -added lithium aluminum germanium phosphate (B-LAGP). Compact thin amorphous LiPON layer could act as a protective interlayer for B-LAGP by separating it from Li metal electrode and mitigate the reaction between them. Large electrochemical stability window (0–5 V) of LiPON/B-LAGP solid electrolyte shows promising feasibility for applications in all lithium based batteries. The aprotic Li-O 2 cell with protected lithium electrode configuration employing LiPON/B-LAGP solid electrolyte has exhibited reasonable cycling stability with long-life of 52 cycles at a limited capacity of 1000 mA h g −1 .

  2. Substrate temperature study in the crystallinity of BaTiO{sub 3} thin films; Estudio de la temperatura de crecimiento sobre la cristalinidad en peliculas delgadas de BaTiO{sub 3}

    Energy Technology Data Exchange (ETDEWEB)

    Marquez-Herrera, Alfredo [Coordinacion Academica Region Altiplano (COARA), Universidad Autonoma de San Luis Potosi, San Luis Potosi (Mexico)]. E-mail: amarquez@mixteco.utm.mx; Hernandez-Rodriguez, Eric Noe; Zapata-Torres, Martin Guadalupe [Centro de Investigacion en Ciencia Aplicada y Tecnologia Avanzada, Unidad Legaria, Instituto Politecnico Nacional (Mexico)]. E-mails: noehmx@hotmail.com; mzapatat@ipn.mx; Cruz-Jauregui, Maria de la Paz [Centro de Nanociencias y Nanotecnologia, Universidad Nacional Autonoma de Mexico (Mexico)]. E-mail: mcruz@cnyn.unam.mx; Melendez-Lira, Miguel angel [Centro de Investigacion y de Estudios Avanzados, Instituto Politecnico Nacional (Mexico)]. E-mail: mlira@fis.cinvestav.mx

    2013-07-15

    Ferroelectric thin films of BaTiO{sub 3} (BTO) were grown on quartz and nichrome substrates using a BaTiO{sub 3} target by RF-Sputtering technique. It was studied the effect of the substrate temperature in the crystallization of the material. These samples were compared with films deposited at room temperature and heat treated out of the growth Chamber. Their crystallinity were studied by X-ray diffraction. Additionally, the optical characterizations were carried out by UV-Vis spectrophotometer. The growth of thin films with substrate temperature allows the obtaining of crystalline materials at temperatures below those reported by other authors. [Spanish] Peliculas delgadas Ferroelectricas de BaTiO{sub 3} (BTO) se depositaron a partir de un blanco de BaTiO{sub 3} mediante la tecnica de RF-Sputtering (erosion catodica por radio frecuencia) sobre substratos de nicromel y cuarzo. Se estudio el efecto de la temperatura de sustrato in-situ en la cristalinidad del material durante su deposito. Estas muestras fueron comparadas con peliculas depositadas a temperatura ambiente y tratadas termicamente posterior al deposito fuera de la camara de crecimiento. El estudio de la cristalinidad fue realizado mediante la tecnica de difraccion de rayos-X. Adicionalmente, se llevaron a cabo caracterizaciones opticas mediante un espectrofotometro UV-Vis. El crecimiento de peliculas delgadas con temperatura de sustrato permite la obtencion de materiales cristalinos a temperaturas por debajo de las reportadas por otros autores.

  3. Spectroellipsometric detection of silicon substrate damage caused by radiofrequency sputtering of niobium oxide

    Science.gov (United States)

    Lohner, Tivadar; Serényi, Miklós; Szilágyi, Edit; Zolnai, Zsolt; Czigány, Zsolt; Khánh, Nguyen Quoc; Petrik, Péter; Fried, Miklós

    2017-11-01

    Substrate surface damage induced by deposition of metal atoms by radiofrequency (rf) sputtering or ion beam sputtering onto single-crystalline silicon (c-Si) surface has been characterized earlier by electrical measurements. The question arises whether it is possible to characterize surface damage using spectroscopic ellipsometry (SE). In our experiments niobium oxide layers were deposited by rf sputtering on c-Si substrates in gas mixture of oxygen and argon. Multiple angle of incidence spectroscopic ellipsometry measurements were performed, a four-layer optical model (surface roughness layer, niobium oxide layer, native silicon oxide layer and ion implantation-amorphized silicon [i-a-Si] layer on a c-Si substrate) was created in order to evaluate the spectra. The evaluations yielded thicknesses of several nm for the i-a-Si layer. Better agreement could be achieved between the measured and the generated spectra by inserting a mixed layer (with components of c-Si and i-a-Si applying the effective medium approximation) between the silicon oxide layer and the c-Si substrate. High depth resolution Rutherford backscattering (RBS) measurements were performed to investigate the interface disorder between the deposited niobium oxide layer and the c-Si substrate. Atomic resolution cross-sectional transmission electron microscopy investigation was applied to visualize the details of the damaged subsurface region of the substrate.

  4. Improvement of the Surface Hardness of Stainless Steel with the TitaniumCarbonitride Ti(CN) Thin Films

    International Nuclear Information System (INIS)

    Agus-Purwadi; Tri-Mardji Atmono; Widdi-Usada; Lely-Susita; Yunanto

    2000-01-01

    Fabrication of the T i (CN) thin films with methods of implantation and RFsputtering for improving the surfaces hardness of stainless steel (SS) hasbeen done. Some kinds of T i C thin films which made individually by varyingof RF sputtering power from 0 up to 160 watt are implanted by the nitrogenion beams on the doses and energy ion optimum of 6.107 x 10 17 ion/cm 2 and100 keV, also fabrication of T i (CN) thin films use RF sputtering method withT i target and reaction gases as argon, silene and nitrogen on the optimum ofsputtering parameter condition. The thin films yields are characterized byusing Microhardness Tester MX 170, obtained SS hardness which layered T i (CN)as 402.5 KHN from its initial of 215.54 KHN and 371.74 KHN (layered T i C), itmeans that the SS surface hardness improve 1.867 times cumulatively. From theX-Ray Diffraction (XRD) analysis yield showed that the microstructure ofT i (CN) films on the SS substrates are dominated by characteristic cubiccrystal structure with Miller plane orientation (111) on the scattering angleof 2 θ = 44 o . Morphology visualization of T i (CN) thin films crosssection on the SS substrate is realized by Spectroscopy Electron Microscope(SEM). (author)

  5. Magnetoelastic coupling in multilayered ferroelectric/ferromagnetic thin films: A quantitative evaluation

    Energy Technology Data Exchange (ETDEWEB)

    Chiolerio, A., E-mail: alessandro.chiolerio@iit.it [Applied Science and Technology Department, Politecnico di Torino, Corso Duca degli Abruzzi 24, IT-10129 Turin (Italy); Center for Space Human Robotics, Istituto Italiano di Tecnologia, Corso Trento 21, IT-10129 Turin (Italy); Quaglio, M. [Center for Space Human Robotics, Istituto Italiano di Tecnologia, Corso Trento 21, IT-10129 Turin (Italy); Lamberti, A. [Applied Science and Technology Department, Politecnico di Torino, Corso Duca degli Abruzzi 24, IT-10129 Turin (Italy); Center for Space Human Robotics, Istituto Italiano di Tecnologia, Corso Trento 21, IT-10129 Turin (Italy); Celegato, F. [Electromagnetism Division, INRIM, Strada delle Cacce 91, IT-10135 Turin (Italy); Balma, D.; Allia, P. [Applied Science and Technology Department, Politecnico di Torino, Corso Duca degli Abruzzi 24, IT-10129 Turin (Italy)

    2012-08-01

    The electrical control of magnetization in a thin film, achieved by means of magnetoelastic coupling between a ferroelectric and a ferromagnetic layer represents an attractive way to implement magnetic information storage and processing within logical architectures known as Magnetic Quantum Cellular Automata (MQCA). Such systems have been addressed as multiferroics. We exploited cost-effective techniques to realize multi-layered multiferroic systems, such as sol-gel deposition and RF sputtering, introducing a specific technique to control the crystal structure and film roughness effect on the magnetic domain wall motion and reconfiguration, induced by magnetoelastic coupling, by evaluating the 2-dimensional statistical properties of enhanced MFM matrices. A RF sputtered 50-nm-thick Co layer on a Si/SiO{sub 2}/Si{sub 3}N{sub 4}/Ti/Pt/PbTiO{sub 3}/Pb(Zr{sub 0.53}Ti{sub 0.47})O{sub 3} substrate was realized, exploiting two differently engineered PZT nano-crystalline structures and the conditions leading to a favorable compromise in order to realize functional devices were elucidated.

  6. Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices

    Directory of Open Access Journals (Sweden)

    Jephias Gwamuri

    2016-01-01

    Full Text Available The opportunity for substantial efficiency enhancements of thin film hydrogenated amorphous silicon (a-Si:H solar photovoltaic (PV cells using plasmonic absorbers requires ultra-thin transparent conducting oxide top electrodes with low resistivity and high transmittances in the visible range of the electromagnetic spectrum. Fabricating ultra-thin indium tin oxide (ITO films (sub-50 nm using conventional methods has presented a number of challenges; however, a novel method involving chemical shaving of thicker (greater than 80 nm RF sputter deposited high-quality ITO films has been demonstrated. This study investigates the effect of oxygen concentration on the etch rates of RF sputter deposited ITO films to provide a detailed understanding of the interaction of all critical experimental parameters to help create even thinner layers to allow for more finely tune plasmonic resonances. ITO films were deposited on silicon substrates with a 98-nm, thermally grown oxide using RF magnetron sputtering with oxygen concentrations of 0, 0.4 and 1.0 sccm and annealed at 300 °C air ambient. Then the films were etched using a combination of water and hydrochloric and nitric acids for 1, 3, 5 and 8 min at room temperature. In-between each etching process cycle, the films were characterized by X-ray diffraction, atomic force microscopy, Raman Spectroscopy, 4-point probe (electrical conductivity, and variable angle spectroscopic ellipsometry. All the films were polycrystalline in nature and highly oriented along the (222 reflection. Ultra-thin ITO films with record low resistivity values (as low as 5.83 × 10−4 Ω·cm were obtained and high optical transparency is exhibited in the 300–1000 nm wavelength region for all the ITO films. The etch rate, preferred crystal lattice growth plane, d-spacing and lattice distortion were also observed to be highly dependent on the nature of growth environment for RF sputter deposited ITO films. The structural, electrical

  7. Investigation of the influence of growth parameters on self-catalyzed ITO nanowires by high RF-power sputtering

    Science.gov (United States)

    Li, Qiang; Zhang, Yuantao; Feng, Lungang; Wang, Zuming; Wang, Tao; Yun, Feng

    2018-04-01

    Tin-doped indium oxide (ITO) nanowires are successfully fabricated using a radio frequency (RF) sputtering technique with a high RF power of 250 W. The fabrication of the ITO nanowires is optimized through the study of oxygen flow rates, temperatures and RF power. The difference in the morphology of the ITO nanowires prepared by using a new target and a used target is observed and the mechanism for the difference is discussed in detail. A hollow structure and air voids within the nanowires are formed during the process of the nanowire growth. The ITO nanowires fabricated by this method demonstrated good conductivity (15 Ω sq-1) and a transmittance of more than 64% at a wavelength longer than 550 nm after annealing. Furthermore, detailed microstructure studies show that the ITO nanowires exhibit a large number of oxygen vacancies. As a result, it is expected that they can be useful for the fabrication of gas sensor devices.

  8. Sputtered gold-coated ITO nanowires by alternating depositions from Indium and ITO targets for application in surface-enhanced Raman scattering

    Science.gov (United States)

    Setti, Grazielle O.; Mamián-López, Mónica B.; Pessoa, Priscila R.; Poppi, Ronei J.; Joanni, Ednan; Jesus, Dosil P.

    2015-08-01

    Indium Tin oxide (ITO) nanowires were deposited by RF sputtering over oxidized silicon using ITO and Indium targets. The nanowires grew on the substrate with a catalyst layer of Indium by the vapor-liquid-solid (VLS) mechanism. Modifications in the deposition conditions affected the morphology and dimensions of the nanowires. The samples, after being covered with gold, were evaluated as surface-enhanced Raman scattering (SERS) substrates for detection of dye solutions and very good intensifications of the Raman signal were obtained. The SERS performance of the samples was also compared to that of a commercial SERS substrate and the results achieved were similar. To the best of our knowledge, this is the first time ITO nanowires were grown by the sputtering technique using oxide and metal targets.

  9. Indium--tin oxide films radio frequency sputtered from specially formulated high density indium--tin oxide targets

    International Nuclear Information System (INIS)

    Kulkarni, S.; Bayard, M.

    1991-01-01

    High density ITO (indium--tin oxide) targets doped with Al 2 O 3 and SiO 2 manufactured in the Tektronix Ceramics Division have been used to rf sputter ITO films of various thicknesses on borosilicate glass substrates. Sputtering in an oxygen--argon gas mixture and annealing in forming gas, resulted in ITO films exhibiting 90% transmission at 550 nm and a sheet resistance of 15 Ω/sq for a thickness of 1100 A. Sputtering in an oxygen--argon gas mixture and annealing in air increased sheet resistance without a large effect on the transmission. Films sputtered in argon gas alone were transparent in the visible and the sheet resistance was found to be 100--180 Ω/sq for the same thickness, without annealing

  10. Structural and optical properties of electro-optic material. Sputtered (Ba,Sr)TiO3

    International Nuclear Information System (INIS)

    Suzuki, Masato; Xu, Zhimou; Tanushi, Yuichiro; Yokoyama, Shin

    2006-01-01

    In order to develop a novel ring resonator optical switch, we have studied the structural and optical properties of the electro-optic material (Ba,Sr)TiO 3 (BST) deposited by RF sputtering on a SiO 2 cladding layer (1.0 μm). The crystallinity of the BST films is evaluated by X-ray diffraction and the optical propagation loss of the waveguides is measured using a He-Ne laser. As a result, it is found that there is a strong relationship between the optical propagation loss and crystallinity of the sputtered film. It is suggested that the propagating light is influenced by the crystal property, for example, the grain size and density of the polycrystalline BST film. (author)

  11. Characteristics of zinc oxide nanorod array/titanium oxide film heterojunction prepared by aqueous solution deposition

    Science.gov (United States)

    Lee, Ming-Kwei; Hong, Min-Hsuan; Li, Bo-Wei

    2016-07-01

    The characteristics of a ZnO nanorod array/TiO2 film heterojunction were investigated. A TiO2 film was prepared on glass by aqueous solution deposition with precursors of ammonium hexafluorotitanate and boric acid at 40 °C. Then, a ZnO seed layer was prepared on a TiO2 film/glass substrate by RF sputtering. A vertically oriented ZnO nanorod array was grown on a ZnO seed layer/TiO2 film/glass substrate by aqueous solution deposition with precursors of zinc nitrate and hexamethylenetetramine (HMT) at 70 °C. After thermal annealing in N2O ambient at 300 °C, this heterojunction used as an oxygen gas sensor shows much better rise time, decay time, and on/off current ratio than as-grown and annealed ZnO nanorods.

  12. Friction and wear measurements of sputtered MoS/sub x/ films amorphized by ion bombardment

    International Nuclear Information System (INIS)

    Mikkelsen, N.J.; Chevallier, J.; Soerensen, G.; Straede, C.A.

    1988-01-01

    The present study presents an experimental evidence for amorphization of rf sputtered MoS/sub x/ films by ion bombardment. Even at low doses (3 x 10 15 ions/cm 2 ) of 400 keV argon ions a complete amorphization was confirmed by x-ray diffraction analysis and transmission electron microscopy. As a result of the ion bombardment the film density increased 100% to almost the bulk value for MoS 2 . The friction coefficient for ion beam amorphized MoS/sub x/ was measured to be 0.04 in agreement with the values reported for crystalline films but disagreeing considerably with the friction coefficient of 0.4 previously reported for amorphous films

  13. Combinatorial study of zinc tin oxide thin-film transistors

    Science.gov (United States)

    McDowell, M. G.; Sanderson, R. J.; Hill, I. G.

    2008-01-01

    Groups of thin-film transistors using a zinc tin oxide semiconductor layer have been fabricated via a combinatorial rf sputtering technique. The ZnO :SnO2 ratio of the film varies as a function of position on the sample, from pure ZnO to SnO2, allowing for a study of zinc tin oxide transistor performance as a function of channel stoichiometry. The devices were found to have mobilities ranging from 2to12cm2/Vs, with two peaks in mobility in devices at ZnO fractions of 0.80±0.03 and 0.25±0.05, and on/off ratios as high as 107. Transistors composed predominantly of SnO2 were found to exhibit light sensitivity which affected both the on/off ratios and threshold voltages of these devices.

  14. Co-sputtered optical films

    Energy Technology Data Exchange (ETDEWEB)

    Misiano, C; Simonetti, E [Selenia S.p.A., Rome (Italy)

    1977-06-01

    The co-sputtering of two dielectric materials with indices of refraction as widely different as possible has been investigated with the aim of obtaining both homogeneous films with an intermediate index of refraction and inhomogeneous films with predetermined profiles. An rf sputtering module is described which has been especially designed, with two separate cathodes and two independent tunable rf generators. The substrates are placed on a circular anode rotating underneath the two cathodes. So far mainly CeO/sub 2/, TiO2 and SiO/sub 2/ targets have been used. The deposition rate from each cathode and the total film thickness are determined by means of two quartz thickness monitors, sputtering compatible. Values obtained for the refractive index and optical thickness are reported, as well as repeatability, mechanical and chemical characteristics, reliability and high power optical radiation resistance. Finally, results obtained on optical components of practical interest are discussed.

  15. Sputter deposition of BSCCO films from a hollow cathode

    International Nuclear Information System (INIS)

    Lanagan, M.T.; Kampwirth, R.T.; Doyle, K.; Kowalski, S.; Miller, D.; Gray, K.E.

    1991-01-01

    High-T c superconducting thin films were deposited onto MgO single crystal substrates from a hollow cathode onto ceramic targets with the nominal composition of Bi 2 Sr 2 CaCu 2 O x . Films similar in composition to those used for the targets were deposited on MgO substrates by rf sputtering. The effects of sputtering time, rf power, and post-annealing on film microstructure and properties were studied in detail. Substrate temperature was found to have a significant influence on the film characteristics. Initial results show that deposition rates from a hollow cathode are an order of magnitude higher than those of a planar magnetron source at equivalent power levels. Large deposition rates allow for the coating of long lengths of wire

  16. Structural and Electromagnetic Properties of Ni-Mn-Ga Thin Films Deposited on Si Substrates

    Directory of Open Access Journals (Sweden)

    Pereira M. J.

    2014-07-01

    Full Text Available Ni2MnGa thin films raise great interest due to their properties, which provide them with strong potential for technological applications. Ni2MnGa thin films were prepared by r.f. sputtering deposition on Si substrates at low temperature (400 ºC. Film thicknesses in the range 10-120 nm were obtained. A study of the structural, magnetic and electrical properties of the films is presented. We find that the deposited films show some degree of crystallinity, with coexisting cubic and tetragonal structural phases, the first one being preponderant over the latter, particularly in the thinner films. The films possess soft magnetic properties and their coercivity is thickness dependent in the range 15-200 Oe at 300K. Electrical resistivity measurements signal the structural transition and suggest the occurrence of avalanche and return-point memory effects, in temperature cycling through the magnetic/structural transition range.

  17. Method for sequentially processing a multi-level interconnect circuit in a vacuum chamber

    Science.gov (United States)

    Routh, D. E.; Sharma, G. C. (Inventor)

    1984-01-01

    An apparatus is disclosed which includes a vacuum system having a vacuum chamber in which wafers are processed on rotating turntables. The vacuum chamber is provided with an RF sputtering system and a dc magnetron sputtering system. A gas inlet introduces various gases to the vacuum chamber and creates various gas plasma during the sputtering steps. The rotating turntables insure that the respective wafers are present under the sputtering guns for an average amount of time such that consistency in sputtering and deposition is achieved. By continuous and sequential processing of the wafers in a common vacuum chamber without removal, the adverse affects of exposure to atmospheric conditions are eliminated providing higher quality circuit contacts and functional device.

  18. Imaging of topological magnetic pinning in superconductor-ferrimagnet bilayer with scanning Hall microscopy

    International Nuclear Information System (INIS)

    Marchevsky, M; Higgins, M J; Bhattacharya, S; Fratello, V J

    2011-01-01

    In a superconducting film deposited on ferromagnetic substrate with perpendicular magnetic anisotropy, vortex matter is confined by the magnetic potential landscape. Using scanning Hall microscopy we visualize flux accumulation and removal in a superconductor-ferrimagnet (S/F) bilayer prepared by rf sputtering of thin niobium film on bismuth-doped rare-earth iron garnet. Penetration of the perpendicular magnetic field in the S/F bilayer follows magnetic domain boundaries and is laterally guided by the garnet magnetization component along the field direction. Upon field removal, localization of the remnant flux at the disclination points of the labyrinthine domain pattern is observed. Our experiments show evidence for strong vortex pinning due the special topology of the domain pattern. Ac magnetic imaging of the transport current distribution in the bilayer reveals complex flow paths commensurate with the magnetic domain boundaries. Topological magnetic pinning can be a useful tool for enhancement and control of critical current in thin film superconductors.

  19. Electrochemical reaction of lithium with orthorhombic bismuth tungstate thin films fabricated by radio-frequency sputtering

    International Nuclear Information System (INIS)

    Li Chilin; Sun Ke; Yu Le; Fu Zhengwen

    2009-01-01

    Bi 2 WO 6 thin films with fast deposition rate have been fabricated by radio-frequency (R.F.) sputtering deposition, and are used as positive electrodes in rechargeable thin film lithium batteries. An initial discharge capacity of 113 μAh/cm 2 -μm is obtainable for Bi 2 WO 6 film electrode with good capacity reversibility. A multiple-center reactive mechanism associated with both Bi 3+ /Bi 0 and W 6+ /W x+ (x 2 WO 6 electrochemical performance with those of Bi 2 O 3 and WO 3 thin films. A possible explanation about smooth capacity loss of Bi 2 WO 6 after long-term cycling is suggested from the incomplete reaction of Bi component. The advantages of Bi 2 WO 6 thin films over the singer-center Bi 2 O 3 or WO 3 thin films are shown in both the aspects of volumetric capacity and cycling life.

  20. Ferroelectric switching in epitaxial PbZr0.2Ti0.8O3/ZnO/GaN heterostructures

    Science.gov (United States)

    Wang, Juan; Salev, Pavel; Grigoriev, Alexei

    As a wide-bandgap semiconductor, ZnO has gained substantial interest due to its favorable properties including high electron mobility, strong room-temperature luminescence, etc. The main obstacle of its application is the lack of reproducible and low-resistivity p-type ZnO. P-type doping of ZnO through the interface charge injection, which can be achieved by the polarization switching of ferroelectric films, is a tempting solution. We explored ferroelectric switching behavior of PbZr0.2Ti0.8O3/ZnO/GaN heterostructures epitaxially grown on Sapphire substrates by RF sputtering. The electrical measurements of Pt/PbZr0.2Ti0.8O3/ZnO/GaN ferroelectric-semiconductor capacitors revealed unusual behavior that is a combination of polarization switching and a diode I-V characteristics.

  1. Engineering the microstructure and magnetism of La{sub 2}CoMnO{sub 6−δ} thin films by tailoring oxygen stoichiometry

    Energy Technology Data Exchange (ETDEWEB)

    Galceran, R.; Frontera, C.; Balcells, Ll.; Cisneros-Fernández, J.; López-Mir, L.; Bozzo, B.; Pomar, A.; Sandiumenge, F.; Martínez, B. [Institut de Ciència de Materials de Barcelona-CSIC, Campus UAB, E-08193 Bellaterra (Spain); Roqueta, J.; Santiso, J. [Institut Català de Nanociència i Nanotecnologia, ICN2-CSIC, Campus UAB, E-08193 Bellaterra (Spain); Bagués, N. [Institut de Ciència de Materials de Barcelona-CSIC, Campus UAB, E-08193 Bellaterra (Spain); Institut Català de Nanociència i Nanotecnologia, ICN2-CSIC, Campus UAB, E-08193 Bellaterra (Spain)

    2014-12-15

    We report on the magnetic and structural properties of ferromagnetic-insulating La{sub 2}CoMnO{sub 6−δ} thin films grown on top of (001) SrTiO{sub 3} substrates by means of RF sputtering technique. Careful structural analysis, by using synchrotron X-ray diffraction, allows identifying two different crystallographic orientations that are closely related to oxygen stoichiometry and to the features (coercive fields and remanence) of the hysteresis loops. Both Curie temperature and magnetic hysteresis turn out to be dependent on the oxygen stoichiometry. In situ annealing conditions allow tailoring the oxygen content of the films, therefore controlling their microstructure and magnetic properties.

  2. Erbium-doped phosphate glass waveguide on silicon with 4.1 dB/cm gain at 1.535 µm

    Science.gov (United States)

    Yan, Y. C.; Faber, A. J.; de Waal, H.; Kik, P. G.; Polman, A.

    1997-11-01

    Erbium-doped multicomponent phosphate glass waveguides were deposited by rf sputtering techniques. The Er concentration was 5.3×1020cm-3. By pumping the waveguide at 980 nm with a power of ˜21 mW, a net optical gain of 4.1 dB at 1.535 μm was achieved. This high gain per unit length at low pump power could be achieved because the Er-Er cooperative upconversion interactions in this heavily Er-doped phosphate glass are very weak [the upconversion coefficient is (2.0±0.5)×10-18 cm3/s], presumably due to the homogeneous distribution of Er in the glass and due to the high optical mode confinement in the waveguide which leads to high pump power density at low pump power.

  3. Er3+ phosphate glass optical waveguide amplifiers at 1.5 μm on silicon

    Science.gov (United States)

    Yan, Yingchao; Faber, Anne J.; de Waal, Henk

    1996-01-01

    RF-sputtering techniques were employed to produce Er-doped phosphate glass films on thermally oxidized silicon wafers. Film compositions were characterized by X-ray photoelectron spectroscopy. As-deposited films showed very low Er luminescence lifetimes. By postannealing of deposited films in pure oxygen, Er photoluminescence emission lifetime of the 4I13/2 - 4I15/2 transition could be increased from 1 - 2 ms to 8 - 9 ms. The long Er lifetime of the deposited films is very promising for achieving an optical gain. A dependence of measured lifetimes on pump power was observed which are related to a up-conversion quenching process. After postannealing, the sputtered waveguides showed relatively low attenuation loss at the potential pumping and signaling wavelengths. The loss spectrum from 700 nm to 1600 nm was measured by two-prism coupling. The films were easy to be patterned by lithography and ridge channel waveguides were developed by argon plasma etching.

  4. On performance limitations and property correlations of Al-doped ZnO deposited by radio-frequency sputtering

    DEFF Research Database (Denmark)

    Crovetto, Andrea; Ottsen, Tobias Sand; Stamate, Eugen

    2016-01-01

    -pressure regime, we find a generalized dependence of the electrical properties, grain size, texture, and Al content on compressive stress, regardless of sputtering pressure or position on the substrate. In a high-pressure regime, a porous microstructure limits the achievable resistivity and causes it to increase......The electrical properties of RF-sputtered Al-doped ZnO are often spatially inhomogeneous and strongly dependent on deposition parameters. In this work, we study the mechanisms that limit the minimum resistivity achievable under different deposition regimes. In a low- and intermediate...... over time as well. The primary cause of inhomogeneity in the electrical properties is identified as energetic particle bombardment. Inhomogeneity in oxygen content is also observed, but its effect on the electrical properties is small and limited to the carrier mobility....

  5. Development of a hybrid sputtering/evaporation process for Cu(In,Ga)Se{sub 2} thin film solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Acciarri, M.; Binetti, S.; Le Donne, A.; Lorenzi, B.; Caccamo, L.; Miglio, L. [Dipartimento di Scienza dei Materiali e Solar Energy Research Center MIB-SOLAR, Universita di Milano Bicocca, Milan (Italy); Moneta, R.; Marchionna, S.; Meschia, M. [Voltasolar s.r.l, Turate (Italy)

    2011-08-15

    In this paper we report a new method for Cu(In,Ga)Se{sub 2} deposition for solar cell application. Differently from the common co-evaporation process, an alterative approach for thin film Cu(In,Ga)Se{sub 2} has been tested: the sputtering deposition of metal elements combined with the selenium evaporation. We have studied the relationships between the growth parameters of our hybrid sputtering/evaporation method and the chemical-physical properties of the CIGS films. The cells are completed with a CdS buffer layer deposited by chemical bath deposition and ZnO + ITO deposited by RF sputtering. Test solar cells of 0.5 cm{sup 2} have shown an efficiency of 10% and 2.5% on glass and stainless steel substrate respectively. (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  6. Influence of substrate temperature and post annealing of CuGaO2 thin films on optical and structural properties

    International Nuclear Information System (INIS)

    Bakar, Muhammad Hafiz Abu; Li, Lam Mui; Salleh, Saafie; Alias, Afishah; Mohamad, Khairul Anuar; Sulaiman, Salina

    2015-01-01

    A transparent p-type thin film CuGaO 2 was deposited by using RF sputtering deposition method on plastic (PET) and glass substrate. The characteristics of the film is investigated. The thin film was deposited at temperature range from 50-250°C and the pressure inside the chamber is 1.0×10 −2 Torr and Argon gas was used as a working gas. The RF power is set to 100 W. The thickness of thin film is 300nm. In this experiment the transparency of the thin film is more than 70% for the visible light region. The band gap obtain is between 3.3 to 3.5 eV. The details of the results will be discussed in the conference

  7. Influence of substrate temperature and post annealing of CuGaO{sub 2} thin films on optical and structural properties

    Energy Technology Data Exchange (ETDEWEB)

    Bakar, Muhammad Hafiz Abu; Li, Lam Mui; Salleh, Saafie; Alias, Afishah [Faculty of Science and Natural Resources, Universiti Malaysia Sabah, 88999, Kota Kinabalu, Sabah (Malaysia); Mohamad, Khairul Anuar; Sulaiman, Salina [Faculty of Engineering, Universiti Malaysia Sabah, 88999 Kota Kinabalu, Sabah (Malaysia)

    2015-08-28

    A transparent p-type thin film CuGaO{sub 2} was deposited by using RF sputtering deposition method on plastic (PET) and glass substrate. The characteristics of the film is investigated. The thin film was deposited at temperature range from 50-250°C and the pressure inside the chamber is 1.0×10{sup −2} Torr and Argon gas was used as a working gas. The RF power is set to 100 W. The thickness of thin film is 300nm. In this experiment the transparency of the thin film is more than 70% for the visible light region. The band gap obtain is between 3.3 to 3.5 eV. The details of the results will be discussed in the conference.

  8. Magnetic properties of amorphous Gd0.67Y0.33

    International Nuclear Information System (INIS)

    Loudghiri, E.; Roky, K.; Hassini, A.; Belayachi, A.; Lassri, H.

    2004-01-01

    Amorphous Gd 0.67 Y 0.33 thin film has been prepared by RF sputtering and its magnetic properties have been studied. The magnetization measurements show that the M(T) curves present a maximum at low temperature and that the magnetic saturation is difficult to obtain even for fields up to 150 kOe for M(H) isotherms. This behavior can be attributed to the competing exchange interactions and the random magnetic anisotropy. The thermomagnetization curve is found to obey the Bloch law; the spin wave stiffness constant and the distance between nearest magnetic atoms were calculated from the experimental results. From an analysis of the approach to saturation magnetization, some fundamental parameters have been extracted

  9. TI--CR--AL--O thin film resistors

    Science.gov (United States)

    Jankowski, Alan F.; Schmid, Anthony P.

    2000-01-01

    Thin films of Ti--Cr--Al--O are used as a resistor material. The films are rf sputter deposited from ceramic targets using a reactive working gas mixture of Ar and O.sub.2. Resistivity values from 10.sup.4 to 10.sup.10 Ohm-cm have been measured for Ti--Cr--Al--O film Ti--Cr--Al--O as a thin film resistor has been found to be thermodynamically stable, unlike other metal-oxide films. The Ti--Cr--Al--O film can be used as a vertical or lateral resistor, for example, as a layer beneath a field emission cathode in a flat panel display; or used to control surface emissivity, for example, as a coating on an insulating material such as vertical wall supports in flat panel displays.

  10. Electrical resistivity of sputtered molybdenum films

    International Nuclear Information System (INIS)

    Nagano, J.

    1980-01-01

    The electrical resistivity of r.f. sputtered molybdenum films of thickness 5-150 nm deposited on oxidized silicon substrates was resolved into the three electron scattering components: isotropic background scattering, scattering at grain boundaries and scattering at surfaces. It was concluded that the isotropic background scattering is almost equal to that of bulk molybdenum and is not influenced by sputtering and annealing conditions. When the film thickness is sufficient that surface scattering can be ignored, the decrease in film resistivity after annealing is caused by the decrease in scattering at the grain boundaries for zero bias sputtered films, and is caused by an increase of the grain diameter for r.f. bias sputtered films. (Auth.)

  11. Effects of the composition of sputtering target on the stability of InGaZnO thin film transistor

    International Nuclear Information System (INIS)

    Huh, Jun-Young; Jeon, Jae-Hong; Choe, Hee-Hwan; Lee, Kang-Woong; Seo, Jong-Huyn; Ryu, Min-Ki; Park, Sang-Hee Ko; Hwang, Chi-Sun; Cheong, Woo-Seok

    2011-01-01

    In this study, we investigated the electrical characteristics and the stability of amorphous indium gallium zinc oxide (a-IGZO) thin film transistors (TFTs) from the viewpoint of active layer composition. Active layers of TFTs were deposited by r.f. sputtering. Two kinds of sputtering targets, which have different compositional ratios of In:Ga:Zn, were used to make variations in the active layer composition. All the fabricated IGZO TFTs showed more excellent characteristics than conventional amorphous silicon TFTs. However, in accordance with the Ga content, IGZO TFTs showed somewhat different electrical characteristics in values such as the threshold voltage and the field effect mobility. The device stability was also dependent on the Ga content, but had trade-off relation with the electrical characteristics.

  12. Characterization of reactively sputtered c-axis aligned nanocrystalline InGaZnO{sub 4}

    Energy Technology Data Exchange (ETDEWEB)

    Lynch, David M.; Zhu, Bin; Ast, Dieter G.; Thompson, Michael O. [Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853 (United States); Levin, Barnaby D. A. [School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853 (United States); Muller, David A. [School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853 (United States); Kavli Institute for Nanoscale Science, Cornell University, Ithaca, New York 14853 (United States); Greene, Raymond G. [Corning Incorporated, Corning, New York 14831 (United States)

    2014-12-29

    Crystallinity and texturing of RF sputtered c-axis aligned crystal InGaZnO{sub 4} (CAAC IGZO) thin films were quantified using X-ray diffraction techniques. Above 190 °C, nanocrystalline films with an X-ray peak at 2θ = 30° (009 planes) developed with increasing c-axis normal texturing up to 310 °C. Under optimal conditions (310 °C, 10% O{sub 2}), films exhibited a c-axis texture full-width half-maximum of 20°. Cross-sectional high-resolution transmission electron microscopy confirmed these results, showing alignment variation of ±9° over a 15 × 15 nm field of view and indicating formation of much larger aligned domains than previously reported. At higher deposition temperatures, c-axis alignment was gradually lost as polycrystalline films developed.

  13. Doping Nitrogen in InGaZnO Thin Film Transistor with Double Layer Channel Structure.

    Science.gov (United States)

    Chang, Sheng-Po; Shan, Deng

    2018-04-01

    This paper presents the electrical characteristics of doping nitrogen in an amorphous InGaZnO thin film transistor. The IGZO:N film, which acted as a channel layer, was deposited using RF sputtering with a nitrogen and argon gas mixture at room temperature. The optimized parameters of the IGZO:N/IGZO TFT are as follows: threshold voltage is 0.5 V, field effect mobility is 14.34 cm2V-1S-1. The on/off current ratio is 106 and subthreshold swing is 1.48 V/decade. The positive gate bias stress stability of InGaZnO doping with nitrogen shows improvement compared to doping with oxygen.

  14. High mobility bottom gate InGaZnO thin film transistors with SiOx etch stopper

    Science.gov (United States)

    Kim, Minkyu; Jeong, Jong Han; Lee, Hun Jung; Ahn, Tae Kyung; Shin, Hyun Soo; Park, Jin-Seong; Jeong, Jae Kyeong; Mo, Yeon-Gon; Kim, Hye Dong

    2007-05-01

    The authors report on the fabrication of thin film transistors (TFTs), which use an amorphous indium gallium zinc oxide (a-IGZO) channel, by rf sputtering at room temperature and for which the channel length and width are patterned by photolithography and dry etching. To prevent plasma damage to the active channel, a 100-nm-thick SiOx layer deposited by plasma enhanced chemical vapor deposition was adopted as an etch stopper structure. The a-IGZO TFT (W /L=10μm/50μm) fabricated on glass exhibited a high field-effect mobility of 35.8cm2/Vs, a subthreshold gate swing value of 0.59V/decade, a thrseshold voltage of 5.9V, and an Ion/off ratio of 4.9×106, which is acceptable for use as the switching transistor of an active-matrix TFT backplane.

  15. High mobility bottom gate InGaZnO thin film transistors with SiOx etch stopper

    International Nuclear Information System (INIS)

    Kim, Minkyu; Jeong, Jong Han; Lee, Hun Jung; Ahn, Tae Kyung; Shin, Hyun Soo; Park, Jin-Seong; Jeong, Jae Kyeong; Mo, Yeon-Gon; Kim, Hye Dong

    2007-01-01

    The authors report on the fabrication of thin film transistors (TFTs), which use an amorphous indium gallium zinc oxide (a-IGZO) channel, by rf sputtering at room temperature and for which the channel length and width are patterned by photolithography and dry etching. To prevent plasma damage to the active channel, a 100-nm-thick SiO x layer deposited by plasma enhanced chemical vapor deposition was adopted as an etch stopper structure. The a-IGZO TFT (W/L=10 μm/50 μm) fabricated on glass exhibited a high field-effect mobility of 35.8 cm 2 /V s, a subthreshold gate swing value of 0.59 V/decade, a thrseshold voltage of 5.9 V, and an I on/off ratio of 4.9x10 6 , which is acceptable for use as the switching transistor of an active-matrix TFT backplane

  16. Degradation sources of CdTe thin film PV: CdCl{sub 2} residue and shunting pinholes

    Energy Technology Data Exchange (ETDEWEB)

    Gorji, Nima E. [University of Bologna, Department of Electrical, Electronics and Information Engineering, Bologna (Italy)

    2014-09-15

    The present work considers two observable phenomena through the experimental fabrication and electrical characterization of the rf-sputtered CdS/CdTe thin film solar cells that extremely reduce the overall conversion efficiency of the device: CdCl{sub 2} residue on the surface of the semiconductor and shunting pinholes. The former happens through nonuniform treatment of the As-deposited solar cells before annealing at high temperature and the latter occurs by shunting pinholes when the cell surface is shunted by defects, wire-like pathways or scratches on the metallic back contact caused from the external contacts. Such physical problems may be quite common in the experimental activities and reduce the performance down to 4-5 % which leads to dismantle the device despite its precise fabrication. We present our electrical characterization on the samples that received wet CdCl{sub 2} surface treatment (uniform or nonuniform) and are damaged by the pinholes. (orig.)

  17. Magnetic and magneto-optical properties of FeRh thin films

    International Nuclear Information System (INIS)

    Inoue, Sho; Nam, Nguyen T.; Phuoc, Nguyen N.; Cao Jiangwei; Yu Ko, Hnin Yu; Suzuki, Takao

    2008-01-01

    The magnetic and magneto-optical properties of FeRh thin films epitaxially deposited onto MgO(1 0 0) substrates by RF sputter-deposition system have been investigated in conjunction with the structure. An intriguing virgin effect has been found in the M-T curves of the as-deposited FeRh thin films, which is presumably interpreted in term of a change in structural phase when heating. Also, a (negative) maximum peak of Kerr rotation at around 3.8 eV has been observed when FeRh thin films are in ferromagnetic state. The polar Kerr rotation angle is found to increase at temperatures above 100 deg. C, which corresponds to the antiferromagnet (AF)-ferromagnet (FM) transition of FeRh thin films

  18. Synthesis of highly ordered nanopores on alumina by two-step anodization process

    Energy Technology Data Exchange (ETDEWEB)

    Bwana, Nicholas N. [University of Oxford, Department of Engineering Science (United Kingdom)], E-mail: Nicholas.Bwana@eng.ox.ac.uk

    2008-02-15

    Highly ordered anodic alumina was produced, on RF sputtered aluminium on a conductive glass substrate, by two step anodizing process in 0.4 M sulphuric acid at constant cell potentials of between 5 and 25 V and at a constant current density of 20 mA cm{sup -2}. The temperature was kept constant at 15 deg. C during both anodization processes. The effects of the anodizing potential, current density, and time on the pore diameters were established. Longer anodization periods result in wider irregular pores with reduced porosity for both constant potential and constant current density anodization processes. The current density increases with increasing constant anodizing potential and generally remains constant with time after a sharp rise. Potential drop during constant current density anodization behaves in a similar manner. We confirm that sulphuric acid has a self-ordering potential of 25 V above which burning occurs.

  19. Defect induced activation of Raman silent modes in rf co-sputtered Mn doped ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Yadav, Harish Kumar [Department of Physics and Astrophysics, University of Delhi, Delhi-110007 (India); Sreenivas, K [Department of Physics and Astrophysics, University of Delhi, Delhi-110007 (India); Katiyar, R S [Department of Physics, University of Puerto Rico, San Juan, PR 00931-3343 (Puerto Rico); Gupta, Vinay [Department of Physics and Astrophysics, University of Delhi, Delhi-110007 (India)

    2007-10-07

    We study the influence of Mn doping on the vibrational properties of rf sputtered ZnO thin films. Raman spectra of the Mn doped ZnO samples reveal two additional vibrational modes, in addition to the host phonon modes, at 252 and 524 cm{sup -1}. The intensity of the additional modes increases continuously with Mn concentration in ZnO and can be used as an indication of Mn incorporation in ZnO. The modes are assigned to the activation of ZnO silent modes due to relaxation of Raman selection rules produced by the breakdown of the translational symmetry of the crystal lattice with the incorporation of Mn at the Zn site. Furthermore, the A{sub 1} (LO) mode is observed with very high intensity in the Raman spectra of undoped ZnO thin film and is attributed to the built-in electric field at the grain boundaries.

  20. Defect induced activation of Raman silent modes in rf co-sputtered Mn doped ZnO thin films

    International Nuclear Information System (INIS)

    Yadav, Harish Kumar; Sreenivas, K; Katiyar, R S; Gupta, Vinay

    2007-01-01

    We study the influence of Mn doping on the vibrational properties of rf sputtered ZnO thin films. Raman spectra of the Mn doped ZnO samples reveal two additional vibrational modes, in addition to the host phonon modes, at 252 and 524 cm -1 . The intensity of the additional modes increases continuously with Mn concentration in ZnO and can be used as an indication of Mn incorporation in ZnO. The modes are assigned to the activation of ZnO silent modes due to relaxation of Raman selection rules produced by the breakdown of the translational symmetry of the crystal lattice with the incorporation of Mn at the Zn site. Furthermore, the A 1 (LO) mode is observed with very high intensity in the Raman spectra of undoped ZnO thin film and is attributed to the built-in electric field at the grain boundaries

  1. Third generation biosensing matrix based on Fe-implanted ZnO thin film

    International Nuclear Information System (INIS)

    Saha, Shibu; Gupta, Vinay; Sreenivas, K.; Tan, H. H.; Jagadish, C.

    2010-01-01

    Third generation biosensor based on Fe-implanted ZnO (Fe-ZnO) thin film has been demonstrated. Implantation of Fe in rf-sputtered ZnO thin film introduces redox center along with shallow donor level and thereby enhance its electron transfer property. Glucose oxidase (GOx), chosen as model enzyme, has been immobilized on the surface of the matrix. Cyclic voltammetry and photometric assay show that the prepared bioelectrode, GOx/Fe-ZnO/ITO/Glass is sensitive to the glucose concentration with enhanced response of 0.326 μA mM -1 cm -2 and low Km of 2.76 mM. The results show promising application of Fe-implanted ZnO thin film as an attractive matrix for third generation biosensing.

  2. Deposition of stress free c-axis oriented LiNbO3 thin film grown on (002) ZnO coated Si substrate

    International Nuclear Information System (INIS)

    Shandilya, Swati; Gupta, Vinay; Tomar, Monika

    2012-01-01

    C-axis oriented lithium niobate thin films have been deposited on Si substrate using RF sputtering technique. A thin buffer layer of c-axis (002) oriented ZnO on Si substrate has been used as a nucleating layer to promote the growth of (006) oriented LiNbO 3 film. The processing gas composition and pressure are found to be very critical in obtaining stress free LiNbO 3 film having desired (006) orientation. The LiNbO 3 films deposited under unique combination of sputtering pressure (10 mTorr) and argon percentage (80%) in reactive gas (Ar + O 2 ) composition become almost stress free having lattice parameter (1.3867 A) close to the bulk value. The observed variation in the structural properties and optical phonon modes observed by Raman spectroscopic studies of the oriented LiNbO 3 thin film with stress has been correlated with growth kinetics.

  3. Room-temperature low-voltage electroluminescence in amorphous carbon nitride thin films

    Science.gov (United States)

    Reyes, R.; Legnani, C.; Ribeiro Pinto, P. M.; Cremona, M.; de Araújo, P. J. G.; Achete, C. A.

    2003-06-01

    White-blue electroluminescent emission with a voltage bias less than 10 V was achieved in rf sputter-deposited amorphous carbon nitride (a-CN) and amorphous silicon carbon nitride (a-SiCN) thin-film-based devices. The heterojunction structures of these devices consist of: Indium tin oxide (ITO), used as a transparent anode; amorphous carbon film as an emission layer, and aluminum as a cathode. The thickness of the carbon films was about 250 Å. In all of the produced diodes, a stable visible emission peaked around 475 nm is observed at room temperature and the emission intensity increases with the current density. For an applied voltage of 14 V, the luminance was about 3 mCd/m2. The electroluminescent properties of the two devices are discussed and compared.

  4. Preparation of Pb(Zr, Ti)O3 Thin Films on Glass Substrates

    Science.gov (United States)

    Hioki, Tsuyoshi; Akiyama, Masahiko; Ueda, Tomomasa; Onozuka, Yutaka; Hara, Yujiro; Suzuki, Kouji

    2000-09-01

    Lead-zirconate-titanate (PZT) thin films were prepared on non-alkaline glass substrates widely used in liquid crystal display (LCD) devices, by plasma-assisted magnetron RF sputtering with an immersed coil. After preparation of the PZT thin film, the glass was available for use in LCD device processing. No mutual diffusion of the elements was recognized between the glass substrate and the bottom electrode. The PZT layer had a dense film structure with rectangular and columnar grains, and only its perovskite phase was crystalline. PZT thin films on a glass substrate had leakage current densities of about 10-8 A/cm2, acceptable hysteresis loop shapes with the remanent polarization (Pr) of 45 μC/cm2 and the coercive field (Ec) of 90 kV/cm. Ferroelectric properties on a glass substrate almost conform with those on a Si-based substrate.

  5. Sputtering. [as deposition technique in mechanical engineering

    Science.gov (United States)

    Spalvins, T.

    1976-01-01

    This paper primarily reviews the potential of using the sputtering process as a deposition technique; however, the manufacturing and sputter etching aspects are also discussed. Since sputtering is not regulated by classical thermodynamics, new multicomponent materials can be developed in any possible chemical composition. The basic mechanism for dc and rf sputtering is described. Sputter-deposition is described in terms of the unique advantageous features it offers such as versatility, momentum transfer, stoichiometry, sputter-etching, target geometry (coating complex surfaces), precise controls, flexibility, ecology, and sputtering rates. Sputtered film characteristics, such as strong adherence and coherence and film morphology, are briefly evaluated in terms of varying the sputtering parameters. Also described are some of the specific industrial areas which are turning to sputter-deposition techniques.

  6. Silver-nickel oxide core-shell nanoflower arrays as high-performance anode for lithium-ion batteries

    Science.gov (United States)

    Zhao, Wenjia; Du, Ning; Zhang, Hui; Yang, Deren

    2015-07-01

    We demonstrate the synthesis of Ag-NiO core-shell nanoflower arrays via a one-step solution-immersion process and subsequent RF-sputtering method. The aligned Ag nanoflower arrays on copper substrate are prepared by a facile displacement reaction in absence of any surfactant at a mild temperature. When used as anode materials for lithium-ion batteries, the Ag-NiO core-shell nanoflower arrays show better cycling performance and higher capacity than the planar NiO electrodes. The improved performance should be attributed to the core-shell structures that can enhance the conductivity and accommodate the volume change during the charge-discharge process.

  7. Longitudinal magnetic bistability of electroplated wires

    International Nuclear Information System (INIS)

    Kurlyandskaya, G.V.; Garcia-Miquel, H.; Vazquez, M.; Svalov, A.V.; Vas'kovskiy, V.O.

    2002-01-01

    Fe 20 Ni 74 Co 6 and Fe 20 Ni 64 Co 16 1 μm thick magnetic tubes electroplated onto Cu 98 Be 2 conductive wire have been investigated in as-deposited state, after heat treatment under longitudinal magnetic field for 1 h at 330 deg. C, and after rf-sputtering deposition of the additional 2 μm Fe 19 Ni 81 layer. Heat treatments and an additional layer deposition modify the shape of hysteresis loops. Magnetically bistable behaviour, observed after the field annealing at a temperature of 330 deg. C, is studied as a function of the length of the samples. This is the first report by our knowledge on the bistable behaviour of the electroplated wires. The bistability of these wires is promising for applications such as tagging or pulse generator applications

  8. Synthesis of nanoscale copper nitride thin film and modification of the surface under high electronic excitation.

    Science.gov (United States)

    Ghosh, S; Tripathi, A; Ganesan, V; Avasthi, D K

    2008-05-01

    Nanoscale (approximately 90 nm) Copper nitride (Cu3N) films are deposited on borosilicate glass and Si substrates by RF sputtering technique in the reactive environment of nitrogen gas. These films are irradiated with 200 MeV Au15+ ions from Pelletron accelerator in order to modify the surface by high electronic energy deposition of heavy ions. Due to irradiation (i) at incident ion fluence of 1 x 10(12) ions/cm2 enhancement of grains, (ii) at 5 x 10912) ions/cm2 mass transport on the films surface, (iii) at 2 x 10(13) ions/cm2 line-like features on Cu3N/glass and nanometallic structures on Cu3N/Si surface are observed. The surface morphology is examined by atomic force microscope (AFM). All results are explained on the basis of a thermal spike model of ion-solid interaction.

  9. Photonic band edge assisted spontaneous emission enhancement from all Er3+ 1-D photonic band gap structure

    Science.gov (United States)

    Chiasera, A.; Meroni, C.; Varas, S.; Valligatla, S.; Scotognella, F.; Boucher, Y. G.; Lukowiak, A.; Zur, L.; Righini, G. C.; Ferrari, M.

    2018-06-01

    All Er3+ doped dielectric 1-D Photonic Band Gap Structure was fabricated by rf-sputtering technique. The structure was constituted by of twenty pairs of SiO2/TiO2 alternated layers doped with Er3+ ions. The scanning electron microscopy was used to check the morphology of the structure. Transmission measurements put in evidence the stop band in the range 1500 nm-1950 nm. The photoluminescence measurements were obtained by optically exciting the sample and detecting the emitted light in the 1.5 μm region at different detection angles. Luminescence spectra and luminescence decay curves put in evidence that the presence of the stop band modify the emission features of the Er3+ ions.

  10. Effect of ion implantation on thin hard coatings

    International Nuclear Information System (INIS)

    Auner, G.; Hsieh, Y.F.; Padmanabhan, K.R.; Chevallier, J.; Soerensen, G.

    1983-01-01

    The surface mechanical properties of thin hard coatings of carbides, nitrides and borides deposited by r.f. sputtering were improved after deposition by ion implantation. The thickness and the stoichiometry of the films were measured by Rutherford backscattering spectrometry and nuclear reaction analysis before and after ion bombardment. The post ion bombardment was achieved with heavy inert ions such as Kr + and Xe + with an energy sufficient to penetrate the film and to reach the substrate. Both the film adhesion and the microhardness were consistently improved. In order to achieve a more detailed understanding, Rb + and Ni + ions were also used as projectiles, and it was found that these ions were more effective than the inert gas ions. (Auth.)

  11. Thermal variation of magnetization in Ni/V multilayers

    International Nuclear Information System (INIS)

    Benkirane, K.; Elkabil, R.; Hamdoun, A.; Lassri, M.; Abid, M.; Lassri, H.; Krishnan, R.

    2004-01-01

    The magnetic properties of Ni/V multilayers, prepared by the RF sputtering method, have been systematically studied by magnetic measurements. The magnetization decreases with a decrease in Ni layer thickness tNi and the analysis of the results at 5K indicates the presence of a dead Ni layer about 12A thick. The effective anisotropy Keff of Ni/V multilayers is obtained using a torque magnetometer. The interface contribution to the magnetic anisotropy is practically negligible. A spin-wave theory has been used to explain the temperature dependence of the magnetization and the approximate values for the bulk exchange interaction Jb, surface exchange interaction JS, and the interlayer coupling strength JI for various Ni layer thicknesses have been obtained

  12. Geometric considerations in magnetron sputtering

    International Nuclear Information System (INIS)

    Thornton, J.A.

    1982-01-01

    The recent development of high performance magnetron type discharge sources has greatly enhaced the range of coating applications where sputtering is a viable deposition process. Magnetron sources can provide high current densities and sputtering rates, even at low pressures. They have much reduced substrate heating rates and can be scaled to large sizes. Magnetron sputter coating apparatuses can have a variety of geometric and plasma configurations. The target geometry affects the emission directions of both the sputtered atoms and the energetic ions which are neutralized and reflected at the cathode. This fact, coupled with the long mean free particle paths which are prevalent at low pressures, can make the coating properties very dependent on the apparatus geometry. This paper reviews the physics of magnetron operation and discusses the influences of apparatus geometry on the use of magnetrons for rf sputtering and reactive sputtering, as well as on the microstructure and internal stresses in sputtered metallic coatings. (author) [pt

  13. Third generation biosensing matrix based on Fe-implanted ZnO thin film

    Science.gov (United States)

    Saha, Shibu; Gupta, Vinay; Sreenivas, K.; Tan, H. H.; Jagadish, C.

    2010-09-01

    Third generation biosensor based on Fe-implanted ZnO (Fe-ZnO) thin film has been demonstrated. Implantation of Fe in rf-sputtered ZnO thin film introduces redox center along with shallow donor level and thereby enhance its electron transfer property. Glucose oxidase (GOx), chosen as model enzyme, has been immobilized on the surface of the matrix. Cyclic voltammetry and photometric assay show that the prepared bioelectrode, GOx/Fe-ZnO/ITO/Glass is sensitive to the glucose concentration with enhanced response of 0.326 μA mM-1 cm-2 and low Km of 2.76 mM. The results show promising application of Fe-implanted ZnO thin film as an attractive matrix for third generation biosensing.

  14. Frequency hopping due to acousto-electric interaction in ZnO based surface acoustic wave oscillator

    Science.gov (United States)

    Dasgupta, Daipayan; Sreenivas, K.

    2011-08-01

    A 36 MHz surface acoustic wave delay line based oscillator has been used to study the effect of acousto-electric interaction due to photo generated charge carriers in rf sputtered ZnO film under UV illumination (λ = 365 nm, 20-100 μW/cm2). Design aspects for developing a delay line based SAW oscillator are specified. The observed linear downshift in frequency (2.2 to 19.0 kHz) with varying UV intensity (20-100 μW/cm2) is related to the fractional velocity change due to acousto-electric interaction. UV illumination level of 100 μW/cm2 leads to a characteristic frequency hopping behavior arising due to a change in the oscillation criteria, and is attributed to the complex interplay between the increased attenuation and velocity shift.

  15. Contribution to the analysis of hydrogenated amorphous silicon by nuclear methods

    International Nuclear Information System (INIS)

    Jeannerot, Luc.

    1981-01-01

    The physico chemical characterization of hydrogenated amorphous silicon thin films (0,5 to 2 μm thick) makes use of nuclear microanalysis for quantitative determination and depth profiling of the elements hydrogen, oxygen, argon and carbon. Concerning the methods, performances of the hydrogen analysis using the 1 H( 15 N, αγ) nuclear reaction are presented emphasizing the precision and the analytical consequences of the interaction ion-material. For charged particles data processing (mainly Rutherford backscattering) computer treatments have been developed either for concentration profile obtention as for spectra prediction of given material configurations. The essential results concerning hydrogenated silicon prepared by RF sputtering are on one hand the correlation between the oxygen incorporation and the beam-induced hydrogen effusion and in the other hand the role of the substrate in the impurities incorporation. From the study of the elaboration conditions of the material a tentative interpretation is made for the incorporation and the role of oxygen [fr

  16. Effect of substrate temperature on structural and optical properties of nitrogen doped SnO2 thin film

    International Nuclear Information System (INIS)

    Thakur, Anup; Kumar, Varinder; Kang, Se Jun; Lee, Ik-Jae; Gautam, Sanjeev; Chae, K. H.; Shin, Hyun Joon

    2014-01-01

    Nitrogen doped SnO 2 thin films (thickness ∼ 250 nm) were deposited at different substrate temperature by radio frequency (rf) sputtering method. Crystal structure, morphology and optical properties of these films were investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and UV-VIS-NIR spectrophotometer, respectively. XRD measurement suggests that the film deposited at room temperature was amorphous in nature and films deposited at higher temperature were crystalline in nature. The film deposited at RT and 200 °C have transparency more than 90% in visible region but the film deposited at 400 °C has lesser transparency. Red shift was observed in the absorption edge may be due to decrease in ionicity due to the formation of the Sn-N bond

  17. Optical properties of tungsten oxide thin films by non-reactive sputtering

    International Nuclear Information System (INIS)

    Acosta, M.; Gonzalez, D.; Riech, I.

    2008-01-01

    Tungsten oxide thin films were grown on glass substrates by RF sputtering at room temperature using a tungsten trioxide target for several values of the Argon pressure (PAr). The structural and morphological properties of these films were studied using X-ray diffraction and Atomic Force Microscopy. The as-deposited films were amorphous irrespective of the Argon pressure, and crystallized in a mixture of hexagonal and monoclinic phases after annealing at a temperature of 3500 C in air. Surface-Roughness increased by an order of magnitude (from 1 nm to 20 nm) after thermal treatment. The Argon pressure, however, had a strong influence on the optical properties of the films. Three different regions are clearly identified: deep blue films for PAr 40 mTorr with high transmittance values. We suggest that the observed changes in optical properties are due to an increasing number of Oxygen vacancies as the growth Argon pressure decreases. (Full text)

  18. In-plane thermal conductivity measurements of ZnO-, ZnS-, and YSZ thin-films on glass substrates

    Energy Technology Data Exchange (ETDEWEB)

    Hartung, David; Gather, Florian; Kronenberger, Achim; Kuhl, Florian; Meyer, Bruno K.; Klar, Peter J. [I. Physikalisches Institut, Justus-Liebig-University, Heinrich-Buff-Ring 16, 35392 Giessen (Germany)

    2012-07-01

    In this work we present in-plane thermal conductivity measurements of ZnO-, ZnS-, and YSZ thin-films. Borosilicate glass with a thickness of 50 microns and low thermal conductivity for improving the signal to noise ratio was used as substrate material. The above different films are deposited by rf-sputtering and have a thickness of about 1 micron. Our approach is a steady-state measurement. A wide metal wire on the film is used as a heater and two parallel lying narrow wires at distances of 100 microns and 200 microns from the heater wire, respectively, serve as the temperature sensors. The wire structure design is transfered on to the thin films by photolithography and metal evaporation. Measurements of the in-plane thermal conductivities of the above mentioned materials are presented and compared with corresponding results in the literature.

  19. PVD Silicon Carbide as a Thin Film Packaging Technology for Antennas on LCP Substrates for Harsh Environments

    Science.gov (United States)

    Scardelletti, Maximilian C.; Stanton, John W.; Ponchak, George E.; Jordan, Jennifer L.; Zorman, Christian A.

    2010-01-01

    This paper describes an effort to develop a thin film packaging technology for microfabricated planar antennas on polymeric substrates based on silicon carbide (SiC) films deposited by physical vapor deposition (PVD). The antennas are coplanar waveguide fed dual frequency folded slot antennas fabricated on liquid crystal polymer (LCP) substrates. The PVD SiC thin films were deposited directly onto the antennas by RF sputtering at room temperature at a chamber pressure of 30 mTorr and a power level of 300 W. The SiC film thickness is 450 nm. The return loss and radiation patterns were measured before and after the SiC-coated antennas were submerged into perchloric acid for 1 hour. No degradation in RF performance or physical integrity of the antenna was observed.

  20. Carbon contaminant in the ion processing of aluminum oxide film

    International Nuclear Information System (INIS)

    Chaug, Y.; Roy, N.

    1989-01-01

    Ion processing can induce contamination on the bombarded surface. However, this process is essential for the microelectronics device fabrication. Auger electron spectroscopy has been used to study the simultaneous deposition of carbon impurity during ion bombardment of magnetron rf-sputtering deposited aluminum oxide film. Ion bombardment on aluminum oxide results in a preferential removal of surface oxygen and a formation of a metastable state of aluminum suboxide. Cosputtered implanted carbon contaminant appears to have formed a new state of stoichiometry on the surface of the ion bombarded aluminum oxide and existed as an aluminum carbide. This phase has formed due to the interaction of the implanted carbon and the aluminum suboxide. The Ar + ion sputter etching rate is reduced for the carbon contaminated oxide. The electrical resistance of the aluminum oxide between two gold strips has been measured. It is found that the electrical resistance is also reduced due to the formation of the new stoichiometry on the surface

  1. Determining thin film properties by fitting optical transmittance

    International Nuclear Information System (INIS)

    Klein, J.D.; Yen, A.; Cogan, S.F.

    1990-01-01

    The optical transmission spectra of rf sputtered tungsten oxide films on glass substrates were modeled to determine absorption edge behavior, film thickness, and index of refraction. Removal of substrate reflection and absorption phenomena from the experimental spectra allowed direct examination of thin film optical characteristics. The interference fringe pattern allows determination of the film thickness and the dependence of the real index of refraction on wavelength. Knowledge of the interference fringe behavior in the vicinity of the absorption edge was found essential to unambiguous determination of the optical band gap. In particular, the apparently random deviations commonly observed in the extrapolation of as-acquired data are eliminated by explicitly considering interference fringe phenomena. The multivariable optimization fitting scheme employed allows air-film-substrate reflection losses to be compensated without making reflectance measurements

  2. Magnetic transition in Co/(Gd-Co) multilayers

    International Nuclear Information System (INIS)

    Svalov, A.V.; Fernandez, A.; Barandiaran, J.M.; Vas'kovskiy, V.O.; Orue, I.; Tejedor, M.; Kurlyandskaya, G.V.

    2008-01-01

    [Co/Gd 0.36 Co 0.64 ] 4 /Co multilayers with Co termination layer have been prepared by rf sputtering. They form macroscopic ferrimagnets with a compensation temperature (T comp ) determined by the thickness ratio of the layers. In low fields the magnetization of Co and Gd-Co layers are along the axis of the applied field. Increasing field makes the moments of both the Co and Gd-Co layers deviate from the axis of the field giving rise to a transition into a twisted state. These magnetic transitions were studied by vibrating sample magnetometer (VSM), magneto-optic Kerr effect and magnetoresistance measurements at various temperatures. The nucleation and evolution of surface- and bulk-twisted magnetic states were also observed in these multilayers

  3. Ferrimagnetic properties of Co/(Gd-Co) multilayers

    International Nuclear Information System (INIS)

    Svalov, A.V.; Fernandez, A.; Vas'kovskiy, V.O.; Tejedor, M.; Barandiaran, J.M.; Orue, I.; Kurlyandskaya, G.V.

    2006-01-01

    Co/(Gd-Co) multilayers have been prepared by rf-sputtering and investigated by means of Transverse Magnetooptic Kerr Effect (TMOKE), SQUID and VSM magnetometry. The composition of amorphous Gd 0.36 Co 0.64 layers was chosen so that their saturation magnetization was dominated by Gd moments in all the temperature range. Co and Gd-Co layers formed a macroscopic ferrimagnetically coupled system displaying a compensation temperature. Complete magnetic moment compensation was found at such point. An inversion of TMOKE hysteresis loops and a divergent behaviour of coercivity were also observed. By changing the layers thickness it has been possible to control the magnetic characteristics of the Co/(Gd-Co) structures, in particular the compensation takes place at different temperatures

  4. Anisotropic magnetoresistance and spin polarization of La0.7Sr0.3MnO3/SrTiO3 superlattices

    International Nuclear Information System (INIS)

    Wang, L.M.; Guo, C.-C.

    2005-01-01

    The crystalline structure, anisotropic magnetoresistance (AMR), and magnetization of La 0.7 Sr 0.3 MnO 3 /SrTiO 3 (LSMO/STO) superlattices grown by a rf sputtering system are systematically analyzed to study the spin polarization of manganite at interfaces. The presence of positive low-temperature AMR in LSMO/STO superlattices implies that two bands of majority and minority character contribute to the transport properties, leading to a reduced spin polarization. Furthermore, the magnetization of superlattices follows the T 3/2 law and decays more quickly as the thickness ratio d STO /d LSMO increases, corresponding to a reduced exchange coupling. The results clearly show that the spin polarization is strongly correlated with the influence of interface-induced strain on the structure

  5. Influence of oxidation temperature on photoluminescence and electrical properties of amorphous thin film SiC:H:O+Tb

    Energy Technology Data Exchange (ETDEWEB)

    Gordienko, S.O.; Nazarov, A.N.; Rusavsky, A.V.; Vasin, A.V.; Gomeniuk, Yu.V.; Lysenko, V.S.; Strelchuk, V.V.; Nikolaenko, A.S. [Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Prospekt Nauki 41, 03028 Kyiv (Ukraine); Ashok, S. [The Pennsylvania State University, Department of Engineering Science, 212 Earth and Engineering Science Bldg., University Park, PA 16802 (United States)

    2011-09-15

    The influence of low-temperature oxidation on chemical composition, luminescent and electrical properties of a-Si{sub 1-x}C{sub x}:H thin films fabricated by reactive RF magnetron sputtering has been studied. A strong dependence on RF sputtering power is seen on the electrical and chemical properties. The a-Si{sub 1-x}C{sub x}:H films fabricated by low RF power levels followed by low-temperature oxidation (at 450 C-500 C) display high intensity of PL, good MOSCV characteristic and low leakage current through the dielectric. Increase of oxidation temperature increases precipitation of carbon nano-inclusions in the materials, that result in reduction of PL intensity and increase of dielectric leakage. (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  6. Energy product enhancement of CoPt films by the alloy addition of Ti

    Energy Technology Data Exchange (ETDEWEB)

    Liao, W.M. [Department of Materials Science and Engineering, Feng Chia University, Taichung, Taiwan (China)]. E-mail: p8993883@knight.fcu.edu; Chen, S.K. [Department of Materials Science and Engineering, Feng Chia University, Taichung, Taiwan (China); Yuan, F.T. [Department of Materials Science and Engineering, Feng Chia University, Taichung, Taiwan (China); Hsu, C.W. [Department of Materials Science and Engineering, Feng Chia University, Taichung, Taiwan (China); Hsiao, S.N. [Department of Materials Science and Engineering, Feng Chia University, Taichung, Taiwan (China); Chang, W.C. [Department of Physics, National Chung Cheng University, Ming-Hsiung, Chia-Yi, Taiwan (China)

    2006-09-15

    Ternary (Co{sub 48}Pt{sub 52}){sub 100-x}Ti{sub x} (x=0, 0.8, 3.7, 5.3) films were deposited on quartz substrates by RF sputtering at the annealing temperatures T{sub a}=500-800deg. C. The addition of Ti was found to suppress the formation of the CoPt-ordered phase. The coercivity squareness parameters (S*) were also increased with the addition of titanium. TEM observations indicated that the Ti addition significantly reduces the grain size of the CoPt film, thus enhances the exchange interaction between the magnetic grains. The advantages result in the increase of (BH){sub max} values from 2.91MGOe for x=0.0 to 6.09 MGOe for x=5.3 after the samples is annealed at an optimum temperature of 700deg. C.

  7. Synthesis of Ag and Au nanoparticles embedded in carbon film: Optical, crystalline and topography analysis

    Science.gov (United States)

    Gholamali, Hediyeh; Shafiekhani, Azizollah; Darabi, Elham; Elahi, Seyed Mohammad

    2018-03-01

    Atomic force microscopy (AFM) images give valuable information about surface roughness of thin films based on the results of power spectral density (PSD) through the fast Fourier transform (FFT) algorithms. In the present work, AFM data are studied for silver and gold nanoparticles (Ag NPs a-C: H and Au NPs a-C: H) embedded in amorphous hydrogenated carbon films and co-deposited on glass substrate via of RF-Sputtering and RF-Plasma Enhanced Chemical Vapor Deposition methods. Here, the working gas is acetylene and the targets are Ag and Au. While time and power are constant, the only variable parameter in this study is initial pressure. In addition, the crystalline structure of Ag NPs a-C: H and Au NPs a-C: H are studied using X-ray diffraction (XRD). UV-visible spectrophotometry will also investigate optical properties and localized surface plasmon resonance (LSPR) of samples.

  8. ZnO-channel thin-film transistors: Channel mobility

    International Nuclear Information System (INIS)

    Hoffman, R.L.

    2004-01-01

    ZnO-channel thin-film transistor (TFT) test structures are fabricated using a bottom-gate structure on thermally oxidized Si; ZnO is deposited via RF sputtering from an oxide target, with an unheated substrate. Electrical characteristics are evaluated, with particular attention given to the extraction and interpretation of transistor channel mobility. ZnO-channel TFT mobility exhibits severe deviation from that assumed by ideal TFT models; mobility extraction methodology must accordingly be recast so as to provide useful insight into device operation. Two mobility metrics, μ avg and μ inc , are developed and proposed as relevant tools in the characterization of nonideal TFTs. These mobility metrics are employed to characterize the ZnO-channel TFTs reported herein; values for μ inc as high as 25 cm2/V s are measured, comprising a substantial increase in ZnO-channel TFT mobility as compared to previously reported performance for such devices

  9. Properties of lift-off structured high T/sub c/ microbridges

    International Nuclear Information System (INIS)

    Hauser, B.; Klopman, B.; Blank, D.; Rogalla, H.

    1989-01-01

    Microbridges and dc-SQUIDs were fabricated in lift-off technique from rf sputtered YBaCuO films on MgO single crystal substrates. Microwave measurements at 9GHz on microbridges and the magnetic field dependence of their critical current reveal wide bridge behavior up to temperatures near the maximum operating temperature of the bridge. Mostly a linear dependence of the critical current on the temperature is found, which is connected to high intrinsic 1/f-nose if the bridge is constant current biased slightly above the critical current. In some bridges and dc-SQUIDs regimes with a temperature dependence proportional to (1-T/T)/sup 1.5/ are found. In this case the 1/f noise level is much smaller and SQUID modulation can be followed to about 65K

  10. Effect of O2 plasma immersion on electrical properties and transistor performance of indium gallium zinc oxide thin films

    International Nuclear Information System (INIS)

    Liu, P.; Chen, T.P.; Liu, Z.; Tan, C.S.; Leong, K.C.

    2013-01-01

    Evolution of electrical properties and thin-film transistor characteristics of amorphous indium gallium zinc oxide (IGZO) thin films synthesized by RF sputtering with O 2 plasma immersion has been examined. O 2 plasma immersion results in an enhancement in the Hall mobility and a decrease in the electron concentration; and the transistor performance can be greatly improved by the O 2 plasma immersion. X-ray photoelectron spectroscopy analysis indicates that the effect of O 2 plasma immersion on the electrical properties and the transistor performance can be attributed to the reduction of the oxygen-related defects in the IGZO thin films. - Highlights: • Oxygen plasma immersion effect on indium gallium zinc oxide thin film properties • Oxygen-related defect reduces in the InGaZnO thin film with oxygen plasma immersion. • Increasing oxygen plasma immersion duration on device will decrease the off current. • Oxygen plasma immersion enhances the performance of device

  11. Imaging of topological magnetic pinning in superconductor-ferrimagnet bilayer with scanning Hall microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Marchevsky, M [Department of Physics, Syracuse University, Syracuse, NY 12344 (United States); Higgins, M J [Princeton High School, Princeton, NJ 08540 (United States); Bhattacharya, S [Tata Institute of Fundamental Research, Mumbai 400 005 (India); Fratello, V J, E-mail: mmartchevskii@lbl.gov [Integrated Photonics, Inc., Hillsborough, NJ 08844 (United States)

    2011-02-15

    In a superconducting film deposited on ferromagnetic substrate with perpendicular magnetic anisotropy, vortex matter is confined by the magnetic potential landscape. Using scanning Hall microscopy we visualize flux accumulation and removal in a superconductor-ferrimagnet (S/F) bilayer prepared by rf sputtering of thin niobium film on bismuth-doped rare-earth iron garnet. Penetration of the perpendicular magnetic field in the S/F bilayer follows magnetic domain boundaries and is laterally guided by the garnet magnetization component along the field direction. Upon field removal, localization of the remnant flux at the disclination points of the labyrinthine domain pattern is observed. Our experiments show evidence for strong vortex pinning due the special topology of the domain pattern. Ac magnetic imaging of the transport current distribution in the bilayer reveals complex flow paths commensurate with the magnetic domain boundaries. Topological magnetic pinning can be a useful tool for enhancement and control of critical current in thin film superconductors.

  12. Electronic Nose For Measuring Wine Evolution In Wine Cellars

    International Nuclear Information System (INIS)

    Lozano, J.; Santos, J. P.; Horrillo, M. C.; Cabellos, J. M.; Arroyo, T.

    2009-01-01

    An electronic nose installed in a wine cellar for measuring the wine evolution is presented in this paper. The system extract the aroma directly from the tanks where wine is stored and carry the volatile compounds to the sensors cell. A tin oxide multisensor, prepared with RF sputtering onto an alumina substrate and doped with chromium and indium, is used. The whole system is fully automated and controlled by computer and can be supervised by internet. Linear techniques like principal component analysis (PCA) and nonlinear ones like probabilistic neural networks (PNN) are used for pattern recognition. Results show that system can detect the evolution of two different wines along 9 months stored in tanks. This system could be trained to detect off-odours of wine and warn the wine expert to correct it as soon as possible, improving the final quality of wine.

  13. Effect of nitrogen incorporation on the structural, optical and dielectric properties of reactive sputter grown ITO films

    Energy Technology Data Exchange (ETDEWEB)

    Gartner, M.; Stroescu, H. [Institute of Physical Chemistry “Ilie Murgulescu”, Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania); Marin, A., E-mail: alexmarin@icf.ro [Institute of Physical Chemistry “Ilie Murgulescu”, Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania); Osiceanu, P. [Institute of Physical Chemistry “Ilie Murgulescu”, Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania); Anastasescu, M., E-mail: manastasescu@icf.ro [Institute of Physical Chemistry “Ilie Murgulescu”, Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania); Stoica, M.; Nicolescu, M.; Duta, M.; Preda, S. [Institute of Physical Chemistry “Ilie Murgulescu”, Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania); Aperathitis, E.; Pantazis, A.; Kampylafka, V. [FORTH-IESL, Crete (Greece); Modreanu, M. [Tyndall National Institute, University College Cork, Cork (Ireland); Zaharescu, M. [Institute of Physical Chemistry “Ilie Murgulescu”, Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania)

    2014-09-15

    Highlights: • Graded optical model for ITON films is presented. • ITON thin films retain an amorphous structure even after RTA at 500 °C in N{sub 2} ambient. • The lowest resistivity was 2 × 10{sup −3} Ω cm for films deposited in 75%N{sub 2} and RTA at 500 °C. • Films deposited in 75% N{sub 2} and RTA at 500 °C have degenerate semiconductor behavior. • Chemical composition before and after RTA has been analyzed by XPS depth profiling. - Abstract: The changes in the optical, microstructural and electrical properties, following the nitrogen incorporation into indium tin oxide thin films are investigated. The films are formed by r.f. sputtering from an indium-tin-oxide (80% In{sub 2}O{sub 3}–20% SnO{sub 2}) target in a mixture of Ar and N{sub 2} plasma (75% N{sub 2}–25% Ar and 100% N{sub 2} respectively) on fused silica glass substrate. The impact of rapid thermal annealing (up to 500 °C, in N{sub 2} ambient) on the properties of indium tin oxynitride (ITON) thin films is also reported. The UV–vis–NIR ellipsometry (SE) characterization of ITON films was performed assuming several realistic approaches based on various oscillator models, using a chemical composition gradient depth profiling, in agreement with the X-ray photoelectron spectroscopy measurements. The Hall measurements show that the ITON films prepared by r.f. sputtering in 75% N{sub 2} and annealed at 500 °C behave as degenerate semiconductors. X-ray diffraction analysis proved that ITON thin films retain an amorphous structure even after RTA at 500 °C in N{sub 2} ambient and atomic force microscopy showed the formation of continuous and smooth ITON thin films, with a morphology consisting in quasispherical nanometric particles.

  14. Pd thin films on flexible substrate for hydrogen sensor

    Energy Technology Data Exchange (ETDEWEB)

    Öztürk, Sadullah [Fatih Sultan Mehmet Vakıf University, Engineering Faculty, Istanbul (Turkey); Kılınç, Necmettin, E-mail: nkilinc@nigde.edu.tr [Nigde University, Mechatronics Engineering Department, 51245 Nigde (Turkey); Nigde University, Nanotechnology Application and Research Center, 51245 Nigde (Turkey)

    2016-07-25

    In this work, palladium (Pd) thin films were prepared via RF sputtering method with various thicknesses (6 nm, 20 nm and 60 nm) on both a flexible substrate and a hard substrate. Hydrogen (H{sub 2}) sensing properties of Pd films on flexible substrate have been investigated depending on temperatures (25–100 °C) and H{sub 2} concentrations (600 ppm – 10%). The effect of H{sub 2} on structural properties of the films was also studied. The films were characterized by Scanning Electron Microscopy (SEM) and X-ray diffraction. It is found that whole Pd films on hard substrate show permanent structural deformation after exposed to 10% H{sub 2} for 30 min. But, this H{sub 2} exposure does not causes any structural deformation for 6 nm Pd film on flexible substrate and 6 nm Pd film on flexible substrate shows reversible sensor response up to 10% H{sub 2} concentration without any structural deformation. On the other hand, Pd film sensors that have the thicknesses 20 nm and 60 nm on flexible substrate are irreversible for higher H{sub 2} concentration (>2%) with film deformation. The sensor response of 6 nm Pd film on flexible substrate increased with increasing H{sub 2} concentration up 4% and then saturated. The sensitivity of the film decreased with increasing operation temperature. - Highlights: • Pd thin films fabricated by RF sputtering on both flexible and hard substrates. • Structural deformation observed for films on hard substrate after exposing 10% H{sub 2}. • 6 nm Pd film on flexible substrate shows reversible sensor response up to 10% H{sub 2}. • H{sub 2} sensing properties of film on flexible substrate investigated depending on temperature and concentration. • The sensitivity of the film decreased with increasing operation temperature.

  15. Effect of electrodeposition and annealing of ZnO on optical and photovoltaic properties of the p-Cu2O/n-ZnO solar cells

    International Nuclear Information System (INIS)

    Hussain, Sajad; Cao Chuanbao; Nabi, Ghulam; Khan, Waheed S.; Usman, Zahid; Mahmood, Tariq

    2011-01-01

    Highlights: → The p-Cu 2 O/n-ZnO heterojunction was fabricated by using electrodeposition and rf sputtering techniques, respectively. → The effect of electrodeposition on optical and photovoltaic properties of the p-Cu 2 O/n-ZnO solar cells has been examined. → The preannealing of ZnO thin films has enhanced the efficiency of solar cells. → The efficiency of the solar cell was measured 0.46%. - Abstract: Cu 2 O/ZnO p-n heterojunction solar cells were fabricated by rf sputtering deposition of n-ZnO layer, followed by electrodeposition of p-Cu 2 O layer. The different electrodeposition potentials were applied to deposit Cu 2 O on ZnO. The particle size, crystal faces, crystallinity of Cu 2 O is important factor which determine the p-n junction interface and consequently their effect on the performance of the heterojunction solar cell. It is observed that at -0.6 V, p-Cu 2 O film generates fewer surface states in the interband region due to the termination of [1 1 0] resulting in higher efficiency (0.24%) with maximum particle size (53 nm). The bandgap of Cu 2 O at this potential is found to be 2.17 eV. Furthermore, annealing of ZnO film was performed to get rid of deteriorating one and two dimensional defects, which always reduce the performance of solar cell significantly. We found that the solar cell performance efficiency is nearly doubled by increasing the annealing temperature of ZnO thin films due to increasing electrical conductance and electron mobility. Doping studies and fine tuning of the junction morphology will be necessary to further improve the performance of Cu 2 O/ZnO heterojunction solar cells.

  16. Effect of the thickness reduction on the structural, surface and magnetic properties of α-Fe{sub 2}O{sub 3} thin films

    Energy Technology Data Exchange (ETDEWEB)

    Aragón, Fermin F.H., E-mail: fherrera@fis.unb.br [Núcleo de Física Aplicada, Instituto de Física, Universidade de Brasília, Brasília, DF 70910-900 (Brazil); Centro de Desenvolvimento da Tecnologia Nuclear, CDTN, 31270-901 Belo Horizonte, MG (Brazil); Ardisson, José D. [Centro de Desenvolvimento da Tecnologia Nuclear, CDTN, 31270-901 Belo Horizonte, MG (Brazil); Aquino, Juan C.R. [Núcleo de Física Aplicada, Instituto de Física, Universidade de Brasília, Brasília, DF 70910-900 (Brazil); Gonzalez, Ismael; Macedo, Waldemar A.A. [Centro de Desenvolvimento da Tecnologia Nuclear, CDTN, 31270-901 Belo Horizonte, MG (Brazil); Coaquira, José A.H.; Mantilla, John; Silva, Sebastião W. da; Morais, Paulo C. [Núcleo de Física Aplicada, Instituto de Física, Universidade de Brasília, Brasília, DF 70910-900 (Brazil)

    2016-05-31

    Hematite (α-Fe{sub 2}O{sub 3}) polycrystalline thin films of different thicknesses were produced by thermal oxidation in air atmosphere from Fe metallic thin-films deposited by radio frequency (RF) sputtering technique. X-ray diffraction (XRD) patterns confirm the formation of hematite phase in all samples and indicate that the mean grain size decreases as the film thickness becomes thinner. Conversion electron Mössbauer spectroscopy (CEMS) spectra at room temperature show magnetic splitting (six line patterns). It is determined that the resonance peaks become broader and asymmetric as the film thickness decreases. This finding was associated with the structural disorder introduced by the thickness reduction. Magnetization as a function of the magnetic field curve obtained at 300 K shows the presence of a weak-ferromagnetic contribution, which was assigned to the large density of decompensated spins at the films surface. From the magnetization vs. temperature curves it has been determined that the Morin transition temperature (T{sub M}) is shifted from ~ 240 K to ~ 196 K, meanwhile it becomes more broadened as the film thickness decreases. X-ray photoelectron spectroscopy (XPS) measurements show the presence of Fe{sup 2+} ions coexisting with Fe{sup 3+} ions whose population increases as the film becomes thinner. The density of chemisorbed oxygen increases as the film thickness is reduced in agreement with the results obtained from the other measurements in this work. - Highlights: • Hematite thin films with different thickness were deposited by RF sputtering technique. • X-ray diffraction patterns confirm the formation of hematite phase in all samples. • Hysteresis curve at 300 K shows the presence of a weak-ferromagnetic phase. • XPS show the presence of Fe{sup 2+} ions coexisting with Fe{sup 3+} ions.

  17. Deposition, characterization, and electronic applications of YBa2Cu3O7 thin films

    International Nuclear Information System (INIS)

    Kromann, R.

    1992-09-01

    YBa 2 Cu 3 O 7 thin films were deposited by rf sputtering and laser ablation. In the case of rf sputtering the presence of negative oxygen ions was found to give rise to severe resputtering effects. In contrast, laser ablation is found to be a much simpler and more reliable depostion method. Structural characterization in the form of an X-ray diffraction study of the structure of laser ablated YBCO thin films is reported. Two films on MgO differing by 75% in the critical current density were examined. The difference was ascribed to the fact that about 5% of the grains in the low J c film grow 45 deg. misoriented with respect to the dominant orientation in the a-b plane. Two other films on SrTiO 3 differing by 70% in J c were examined. Various ways of achieving a 45 deg. grain boundary by a biepitaxial process on MgO substrates are described. The grain boundary junctions are used to fabricate DC SQUIDs. It is demonstrated that the SQUIDs exhibit critical current modulation in a magnetic field at temperatures up to 80 K. It is shown that the 1/f noise can be reduced by a factor of 3 by the double modulation technique, indicating that the dominant contribution to the 1/f noise comes from critical current fluctuations. The high level of 1/f noise from critical current fluctuations is ascribed to the nature of the 45 deg. grain boundary and it is argued that it is necessary to develop a bi-epitaxial process for grain boundaries with angles less than 45 deg.. Finally, it is demonstrated that a SQUID and a flux transformer can be fabricated on the same substrate to form an integrated magnetometer. (au) (8 tabs., 58 ills., 97 refs.)

  18. Improved performance of dye-sensitized solar cell with a specially tailored TiO{sub 2} compact layer prepared by RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Abdullah, M.H., E-mail: hanapiah801@ppinang.uitm.edu.my [NANO-Electronic Centre, Faculty of Electrical Engineering, Universiti Teknologi MARA (UiTM), 40450 Shah Alam, Selangor (Malaysia); Rusop, M. [NANO-Electronic Centre, Faculty of Electrical Engineering, Universiti Teknologi MARA (UiTM), 40450 Shah Alam, Selangor (Malaysia); NANO-SciTech Centre, Institute of Science, Universiti Teknologi MARA (UiTM), 40450 Shah Alam, Selangor (Malaysia)

    2014-07-05

    Highlights: • A novel gradient index antireflective TiO{sub 2} compact layer based DSSC was fabricated. • Higher right-shifted transmittance spectra favour the spectral response of N719 dye. • The arc-TiO{sub 2} film on ITO has decreased the charge interfacial resistance, R{sub 1}. • The arc-TiO{sub 2} film prevents electrons recombination at ITO and nc-TiO{sub 2} interfaces. • Almost 42% increment in the overall efficiency compared to the bare ITO cell. - Abstract: We demonstrate that a graded index TiO{sub 2} antireflective compact layer (arc-TiO{sub 2}) employed by RF sputtering can modulate the optical transmittance and reduce the electron recombination in dye-sensitized solar cell (DSSC). The spectral response of the DSSC is improved, due to higher and red-shifted transmittance spectra in a specific region that favours the sensitization effect of the dye. The effects of arc-TiO{sub 2} prepared at various RF sputtering powers to the performances of DSSC were investigated by means of the incident photo to current efficiency (IPCE), open-circuit voltage decay (OCVD) and electrochemical impedance spectroscopy (EIS). The slow decay of the photo-voltage attributed to the desirable merits of the arc-TiO{sub 2} compact layer has been evidenced by the OCVD measurement. Meanwhile, the improvement of adhesion between an arc-TiO{sub 2} film and porous-TiO{sub 2} has decreased the interfacial-charge resistance, R{sub 1} in the EIS measurement. This lower R{sub 1} then facilitates the charge-transfer process of the electron in the DSSC. At 100 W of RF power, these blended effects improved the overall conversion efficiency of the DSSC by an increase of 42% compared to the cell without the compact layer.

  19. Comparison of the electrical and optical properties of direct current and radio frequency sputtered amorphous indium gallium zinc oxide films

    International Nuclear Information System (INIS)

    Yao, Jianke; Gong, Li; Xie, Lei; Zhang, Shengdong

    2013-01-01

    The electrical and optical properties of direct current and radio frequency (RF) sputtered amorphous indium gallium zinc oxide (a-IGZO) films are compared. It is found that the RF sputtered a-IGZO films have better stoichiometry (In:Ga:Zn:O = 1:1:1:2.5–3.0), lower electrical conductivity (σ < 8 S/cm), higher refractive index (n = 1.9–2.0) and larger band gap (E g = 3.02–3.29 eV), and show less shift of Fermi level (△ E F ∼ 0.26 eV) and increased concentration of electrons (△ N e ∼ 10 4 ) in the conduction band with the reduction concentration of oxygen vacancy (V O ). Although a-IGZO has intensively been studied for a semiconductor channel material of thin film transistors in next-generation flat panel displays, its fundamental material parameters have not been thoroughly reported. In this work, the work function (φ) of a-IGZO films is tested with the ultraviolet photoelectron spectroscopy. It is found that the φ of a-IGZO films is in the range of 4.0–5.0 eV depending on the V O . - Highlights: ► Amorphous InGaZnO 4 (a-IGZO) films were prepared with different sputtering modes. ► Electrical and optical properties of the different films were compared. ► Fermi level (△E F ) shift in a-IGZO films were tested by X-ray photoelectron spectroscopy. ► The relation of △E F with the properties of a-IGZO films were discussed. ► Work function was tested by ultraviolet photoelectron spectroscopy

  20. Amorphous Si layers co-doped with B and Mn: Thin film growth and steering of magnetic properties

    International Nuclear Information System (INIS)

    Drera, G.; Mozzati, M.C.; Colombi, P.; Salvinelli, G.; Pagliara, S.; Visentin, D.; Sangaletti, L.

    2015-01-01

    Amorphous silicon thin films co-doped with manganese (5% at.) and boron (1.8% at.) have been prepared by RF sputtering on Al 2 O 3 substrates held at room temperature (RT). The films, with an average thickness of about 0.9 μm, were carefully characterized by micro-Raman and X-ray photoemission spectroscopies. A ferromagnetic (FM) behavior up to RT was observed. In order to discuss and possibly rule out extrinsic effects usually related to segregations of ferromagnetic impurities in the samples, magnetization measurements were carried out on the Al 2 O 3 substrates, as well as on Si:B and Si:Mn films grown with the same RF sputtering system. Only the Si:B:Mn films displayed a FM behavior up to RT. Since amorphous films doped with Mn alone did not display any signature of FM ordering, boron co-doping results to be crucial for the onset of the FM behavior. The conductivity of the samples is not affected by boron doping that, therefore, does not appear to significantly contribute to a possible carrier-mediated FM interaction between Mn ions by supplying extra charges to the system. On this basis, the capability of B to hinder the quenching of the Mn 3d magnetic moments has also to be regarded as a possible role of this co-dopant in the observed magnetization. - Highlights: • We successfully deposited amorphous silicon thin films co-doped with Mn and B. • Structural, electronic, and magnetic properties have been carefully characterized. • A ferromagnetic behavior up to room temperature was detected. • The extrinsic origin of magnetism is excluded. • Boron can play a relevant role to avoid quenching of magnetic moment in Mn ions

  1. Amorphous Si layers co-doped with B and Mn: Thin film growth and steering of magnetic properties

    Energy Technology Data Exchange (ETDEWEB)

    Drera, G. [I-LAMP, Dipartimento di Matematica e Fisica, Università Cattolica del Sacro Cuore, Via dei Musei 41, 25121 Brescia (Italy); Mozzati, M.C. [CNISM, Dipartimento di Fisica, Università di Pavia, Via Bassi 6, 27100 Pavia (Italy); Colombi, P. [CSMT Gestione s.c.a.r.l, Via Branze 45, 25123 Brescia (Italy); Salvinelli, G.; Pagliara, S.; Visentin, D. [I-LAMP, Dipartimento di Matematica e Fisica, Università Cattolica del Sacro Cuore, Via dei Musei 41, 25121 Brescia (Italy); Sangaletti, L., E-mail: sangalet@dmf.unicatt.it [I-LAMP, Dipartimento di Matematica e Fisica, Università Cattolica del Sacro Cuore, Via dei Musei 41, 25121 Brescia (Italy)

    2015-09-01

    Amorphous silicon thin films co-doped with manganese (5% at.) and boron (1.8% at.) have been prepared by RF sputtering on Al{sub 2}O{sub 3} substrates held at room temperature (RT). The films, with an average thickness of about 0.9 μm, were carefully characterized by micro-Raman and X-ray photoemission spectroscopies. A ferromagnetic (FM) behavior up to RT was observed. In order to discuss and possibly rule out extrinsic effects usually related to segregations of ferromagnetic impurities in the samples, magnetization measurements were carried out on the Al{sub 2}O{sub 3} substrates, as well as on Si:B and Si:Mn films grown with the same RF sputtering system. Only the Si:B:Mn films displayed a FM behavior up to RT. Since amorphous films doped with Mn alone did not display any signature of FM ordering, boron co-doping results to be crucial for the onset of the FM behavior. The conductivity of the samples is not affected by boron doping that, therefore, does not appear to significantly contribute to a possible carrier-mediated FM interaction between Mn ions by supplying extra charges to the system. On this basis, the capability of B to hinder the quenching of the Mn 3d magnetic moments has also to be regarded as a possible role of this co-dopant in the observed magnetization. - Highlights: • We successfully deposited amorphous silicon thin films co-doped with Mn and B. • Structural, electronic, and magnetic properties have been carefully characterized. • A ferromagnetic behavior up to room temperature was detected. • The extrinsic origin of magnetism is excluded. • Boron can play a relevant role to avoid quenching of magnetic moment in Mn ions.

  2. Fabrication Localized Surface Plasmon Resonance sensor chip of gold nanoparticles and detection lipase–osmolytes interaction

    Energy Technology Data Exchange (ETDEWEB)

    Ghodselahi, T., E-mail: t_ghodselahi@yahoo.com [Nano Mabna Iranian Inc., PO Box 1676664116, Tehran (Iran, Islamic Republic of); School of Physics, Institute for Research in Fundamental Sciences, PO Box 19395-5531, Tehran (Iran, Islamic Republic of); Hoornam, S. [Nano Mabna Iranian Inc., PO Box 1676664116, Tehran (Iran, Islamic Republic of); School of Physics, Institute for Research in Fundamental Sciences, PO Box 19395-5531, Tehran (Iran, Islamic Republic of); Department of Science, Central Tehran Branch, Islamic Azad University, Tehran (Iran, Islamic Republic of); Vesaghi, M.A. [Department of Physics, Sharif University of Technology, PO Box 11365-9161, Tehran (Iran, Islamic Republic of); Ranjbar, B.; Azizi, A. [Department of Biophysics, Tarbiat Modares University, Tehran (Iran, Islamic Republic of); Mobasheri, H. [Laboratory of Membrane Biophysics, Institute of Biochemistry and Biophysics, University of Tehran, PO Box 13145-1384, Tehran (Iran, Islamic Republic of); Biomaterials Research Institute (BRC), University of Tehran, Tehran (Iran, Islamic Republic of)

    2014-09-30

    Highlights: • We synthesized localized surface plasmon resonance sensor of gold nanoparticles by RF-sputtering and RF-PECVD. • LSPR sensor was characterized by TEM, XPS, AFM. • LSPR sensor was utilized to detect interaction between sorbitol and trehalose, with Pesudomonace Cepacia Lipase (PCL). • Unlike to trehalose, sorbitol interacts with the PCL. • Refractive index of PCL was obtained by Mie theory modeling. - Abstract: Co-deposition of RF-sputtering and RF-PECVD from acetylene gas and Au target were used to prepare sensor chip of gold nanoparticles (Au NPs). Deposition conditions were optimized to reach a Localized Surface Plasmon Resonance (LSPR) sensor chip of Au NPs with particle size less than 10 nm. The RF power was set at 180 W and the initial gas pressure was set at 0.035 mbar. Transmission Electron Microscopy (TEM) images and Atomic Force Microscopy (AFM) data were used to investigate particles size and surface morphology of LSPR sensor chip. The Au and C content of the LSPR sensor chip of Au NPs was obtained from X-ray photoelectron spectroscopy (XPS). The hydrogenated amorphous carbon (a-C:H) thin film was used as intermediate material to immobilize Au NPs on the SiO{sub 2} substrate. The interaction between two types of osmolytes, i.e. sorbitol and trehalose, with Pseudomonas cepacia lipase (PCL) were detected by the prepared LSPR biosensor chip. The detection mechanism is based on LSPR spectroscopy in which the wavelength of absorption peak is sensitive to the refractive index of the environment of the Au NPs. This mechanism eliminates the use of a probe or immobilization of PCL on the Au NPs of LSPR sensor chip. The interaction between PCL and osmolytes can change refractive index of the mixture or solution. We found that unlike to trehalose, sorbitol interacts with the PCL. This interaction increases refractive index of the PCL and sorbitol mixture. Refractive index of PCL in the presence of different concentration of sorbitol was

  3. Wettability properties of PTFE/ZnO nanorods thin film exhibiting UV-resilient superhydrophobicity

    International Nuclear Information System (INIS)

    Bayat, A.; Ebrahimi, M.; Nourmohammadi, A.; Moshfegh, A.Z.

    2015-01-01

    Highlights: • Thin layer of Teflon was deposited on ZnO nanorods using RF sputtering technique. • Water contact angle was measured from 3° for ZnO to 160° for the PTFE/ZnO. • Very low contact angle hysteresis of ∼2° and sliding angle of ∼1° was measured. • Excellent stability under UV illumination was observed for the PTFE/ZnO sample. • We have proposed a model to describe wettability property supporting our data. - Abstract: In this research, initially anodization process was used to fabricate ZnO nanorods on Zn substrate and then RF sputtering technique was applied to grow a thin layer of polytetrafluoroethylene (PTFE, Teflon) on the coated ZnO nanorods for producing a superhydrophobic surface. According to scanning electron microscopy (SEM) observations, ZnO nanorods were formed with average diameter and length of about ∼180 nm and 14 μm, respectively. Superhydrophilic property of ZnO nanorods and superhydrophobic property of PTFE/ZnO nanorods was investigated by water contact angle (WCA) measurements. It was found that the contact angle varied with the PTFE deposition time. The highest contact angle measurement was obtained at 160° for the PTFE (60 min coating)/ZnO as optimum sample which indicates its superhydrophobic property. X-ray photoelectron spectroscopy (XPS) determined surface chemical composition and F/C ratio of about 1.27 for this sample. A change of water contact angle from 3° to 160° indicates transition from superhydrophilic to superhydrophobic state. Very low contact angle hysteresis (CAH) of ∼2° and sliding angle (SA) of ∼1° as well as unchanged contact angle under UV illumination was observed for the synthesized optimum PTFE/ZnO sample exhibits an excellent superhydrophobic property. Based on our data analysis, the ZnO nanorods and the PTFE/ZnO nanorods obey Wenzel and Cassie–Baxter model, respectively

  4. Advanced properties of Al-doped ZnO films with a seed layer approach for industrial thin film photovoltaic application

    International Nuclear Information System (INIS)

    Dewald, Wilma; Sittinger, Volker; Szyszka, Bernd; Säuberlich, Frank; Stannowski, Bernd; Köhl, Dominik; Ries, Patrick; Wuttig, Matthias

    2013-01-01

    Currently sputtered Al-doped ZnO films are transferred to industry for the application in thin film silicon solar modules. These films are known to easily form light trapping structures upon etching which are necessary for absorbers with low absorbance such as μc-Si. Up to now the best structures for high efficiency thin film silicon solar cells were obtained by low rate radio frequency (r.f.) sputtering of ceramic targets. However, for industrial application a high rate process is essential. Therefore a seed layer approach was developed to increase the deposition rate while keeping the desired etch morphology and electrical properties. Aluminum doped ZnO films were deposited dynamically by direct current (d.c.) magnetron sputtering from a ceramic ZnO:Al 2 O 3 target (1 wt.%) onto an additional seed layer prepared by r.f. sputtering. ZnO:Al films were investigated with respect to their optical and electrical properties as well as the morphology created after etching for a-Si/μc-Si solar cells. Additionally atomic force microscopy, scanning electron microscopy, X-ray diffraction and Hall measurements were performed, comparing purely r.f. or d.c. sputtered films with d.c. sputtered films on seed layers. With the seed layer approach it was possible to deposit ZnO:Al films with a visual transmittance of 83.5%, resistivity of 295 μΩ cm, electron mobility of 48.9 cm 2 /Vs and electron density of 4.3 · 10 20 cm −3 from a ceramic target at 330 °C. Etch morphologies with 1 μm lateral structure size were achieved. - Highlights: ► Seed layer approach for dynamic sputter deposition of enhanced quality ZnO:Al. ► A thin radio frequency sputtered ZnO:Al layer assists film nucleation on glass. ► Electron mobility was increased up to 49 cm 2 /Vs due to quasi-epitaxial film growth. ► Etch morphology exhibits 1 μm wide craters for light trapping in solar cells. ► The concept was transferred to a seed layer sputtered with direct current

  5. Advanced properties of Al-doped ZnO films with a seed layer approach for industrial thin film photovoltaic application

    Energy Technology Data Exchange (ETDEWEB)

    Dewald, Wilma, E-mail: wilma.dewald@ist.fraunhofer.de [Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54E, 38108 Braunschweig (Germany); Sittinger, Volker; Szyszka, Bernd [Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54E, 38108 Braunschweig (Germany); Säuberlich, Frank; Stannowski, Bernd [Sontor GmbH, OT Thalheim, Sonnenallee 7-11, 06766 Bitterfeld-Wolfen (Germany); Köhl, Dominik; Ries, Patrick; Wuttig, Matthias [I. Physikalisches Institut (IA), RWTH Aachen, Sommerfeldstraße 14, 52074 Aachen (Germany)

    2013-05-01

    Currently sputtered Al-doped ZnO films are transferred to industry for the application in thin film silicon solar modules. These films are known to easily form light trapping structures upon etching which are necessary for absorbers with low absorbance such as μc-Si. Up to now the best structures for high efficiency thin film silicon solar cells were obtained by low rate radio frequency (r.f.) sputtering of ceramic targets. However, for industrial application a high rate process is essential. Therefore a seed layer approach was developed to increase the deposition rate while keeping the desired etch morphology and electrical properties. Aluminum doped ZnO films were deposited dynamically by direct current (d.c.) magnetron sputtering from a ceramic ZnO:Al{sub 2}O{sub 3} target (1 wt.%) onto an additional seed layer prepared by r.f. sputtering. ZnO:Al films were investigated with respect to their optical and electrical properties as well as the morphology created after etching for a-Si/μc-Si solar cells. Additionally atomic force microscopy, scanning electron microscopy, X-ray diffraction and Hall measurements were performed, comparing purely r.f. or d.c. sputtered films with d.c. sputtered films on seed layers. With the seed layer approach it was possible to deposit ZnO:Al films with a visual transmittance of 83.5%, resistivity of 295 μΩ cm, electron mobility of 48.9 cm{sup 2}/Vs and electron density of 4.3 · 10{sup 20} cm{sup −3} from a ceramic target at 330 °C. Etch morphologies with 1 μm lateral structure size were achieved. - Highlights: ► Seed layer approach for dynamic sputter deposition of enhanced quality ZnO:Al. ► A thin radio frequency sputtered ZnO:Al layer assists film nucleation on glass. ► Electron mobility was increased up to 49 cm{sup 2}/Vs due to quasi-epitaxial film growth. ► Etch morphology exhibits 1 μm wide craters for light trapping in solar cells. ► The concept was transferred to a seed layer sputtered with direct current.

  6. Dye-sensitized solar cell based on AZO/Ag/AZO multilayer transparent conductive oxide film

    Energy Technology Data Exchange (ETDEWEB)

    Qi, Jin-He; Li, Ying [School of Materials Science and Engineering, Shanghai University, 149 Yanchang Road, Shanghai 200072 (China); Duong, Thanh-Tung; Choi, Hyung-Jin [Department of Materials Engineering, Chungnam National University, Daeduk Science Town, 305-764 Daejeon (Korea, Republic of); Yoon, Soon-Gil, E-mail: sgyoon@cnu.ac.kr [Department of Materials Engineering, Chungnam National University, Daeduk Science Town, 305-764 Daejeon (Korea, Republic of)

    2013-04-15

    Highlights: ► AZO/Ag/AZO (AAA) multilayer was used for working electrode of DSSC cell. ► The 100 nm-thick Nb-doped TiO{sub 2} layer showed a good blocking effect. ► The DSSC cell by AAA TCO material showed the highest efficiency of about 3.25%. -- Abstract: Niobium-doped TiO{sub 2} blocking layer and Al-doped ZnO (AZO)/Ag/AZO (AAA) TCO layers were grown onto glass substrate using pulsed laser deposition (PLD) and direct current (dc)/radio-frequency (rf) sputtering at room temperature, respectively for dye-sensitized solar cell (DSSC) applications. The 100 nm-thick NTO layer showed a blocking effect for the oxygen diffusion into AAA layer and for the recombination of the electrons. The DSSC cell composed of the NTO (100 nm)/AAA (400 nm) showed the highest photo-electrical efficiency of about 3.25%. An insertion of aluminum foil between serrated clip and AAA (100 nm) TCO improved a photo-conversion efficiency of the DSSC.

  7. Characterisation of different single and multilayer films using phase modulated spectroscopic ellipsometry

    International Nuclear Information System (INIS)

    Das, N.C.; Bhattacharyya, D.; Thakur, S.

    1998-06-01

    Different single layers and multilayer coatings deposited by e-beam evaporation and r.f. sputtering techniques have been characterised by the Phase Modulated Spectroscopic Ellipsometer, installed recently in the Spectroscopy Division, B.A.R.C. The Phase Modulated technique provides a faster and more accurate data acquisition process than the conventional ellipsometry. Measurements have been done on single layers of Cu, Si and ZrO 2 films and on multilayer thin films devices e.g., high reflectivity mirror, beam combiner, beam splitter, narrow band filter etc. consisting of several bilayers of TiO 2 /SiO 2 . The measured Ellipsometry spectra is then fitted with a theoretical spectra generated assuming an appropriate model regarding the sample. The layer thickness and composition have been used as fitting parameters. The optical constants of the substrates have been supplied and a trial dispersion relation have been used for the layers. In case of inhomogeneous layers, trial compositions have been given for the individual components for each layer. The roughness of the layers has been taken into account by assuming the film to be an inhomogeneous mixture of material and voids. The fittings have been done objectively by minimising the squared difference (χ 2 ) between the measured and calculated values of the ellipsometric parameters and thus accurate information have been derived regarding the thickness and optical constants (viz, the refractive index and extinction coefficient) of the different layers, the surface roughness and the inhomogeneities present in the layers. (author)

  8. Sputtered indium-tin oxide/cadmium telluride junctions and cadmium telluride surfaces

    International Nuclear Information System (INIS)

    Courreges, F.G.; Fahrenbruch, A.L.; Bube, R.H.

    1980-01-01

    The properties of indium-tin oxide (ITO)/CdTe junction solar cells prepared by rf sputtering of ITO on P-doped CdTe single-crystal substrates have been investigated through measurements of the electrical and photovoltaic properties of ITO/CdTe and In/CdTe junctions, and of electron beam induced currents (EBIC) in ITO/CdTe junctions. In addition, surface properties of CdTe related to the sputtering process were investigated as a function of sputter etching and thermal oxidation using the techniques of surface photovoltage and photoluminescence. ITO/CdTe cells prepared by this sputtering method consist of an n + -ITO/n-CdTe/p-CdTe buried homojunction with about a 1-μm-thick n-type CdTe layer formed by heating of the surface of the CdTe during sputtering. Solar efficiencies up to 8% have been observed with V/sub 0c/=0.82 V and J/sub s/c=14.5 mA/cm 2 . The chief degradation mechanism involves a decrease in V/sub 0c/ with a transformation of the buried homojunction structure to an actual ITO/CdTe heterojunction

  9. Improved photoelectrochemical performance of BiVO4/MoO3 heterostructure thin films

    Science.gov (United States)

    Kodan, Nisha; Mehta, B. R.

    2018-05-01

    Bismuth vanadate (BiVO4) and Molybdenum trioxide (MoO3) thin films have been prepared by RF sputtering technique. BiVO4 thin films were deposited on indium doped tin oxide (In: SnO2; ITO) substrates at room temperature and 80W applied rf power. The prepared BiVO4 thin films were further annealed at 450°C for 2 hours in air to obtain crystalline monoclinic phase and successively coated with MoO3 thin films deposited at 150W rf power and 400°C for 30 minutes. The effect of coupling BiVO4 and MoO3 on the structural, optical and photoelectrochemical (PEC) properties have been studied. Optical studies reveal that coupling of BiVO4 and MoO3 results in improvement of optical absorption in visible region of solar spectrum. PEC study shows approximate 3-fold and 38-fold increment in photocurrent values of BiVO4/MoO3 (0.38 mA/cm2) heterostructure thin film as compared to MoO3 (0.15 mA/cm2) and BiVO4 (10 µA/cm2) thin films at applied bias of 1 V vs Ag/AgCl in 0.5 M Na2SO4 (pH=7) electrolyte.

  10. Sputtered gold-coated ITO nanowires by alternating depositions from Indium and ITO targets for application in surface-enhanced Raman scattering

    International Nuclear Information System (INIS)

    Setti, Grazielle O.; Mamián-López, Mónica B.; Pessoa, Priscila R.; Poppi, Ronei J.; Joanni, Ednan; Jesus, Dosil P.

    2015-01-01

    Graphical abstract: - Highlights: • ITO nanowires were grown by the sputtering method using a new synthesis procedure. • By changing the deposition parameters the morphology and dimensions of the nanostructures were modified. • Seed layer thickness was an important factor for obtaining branched nanowires. • SERS substrates having good performance and a high application potential were produced. • The first Raman results for our substrates are already comparable to commercial substrates. - Abstract: Indium Tin oxide (ITO) nanowires were deposited by RF sputtering over oxidized silicon using ITO and Indium targets. The nanowires grew on the substrate with a catalyst layer of Indium by the vapor–liquid–solid (VLS) mechanism. Modifications in the deposition conditions affected the morphology and dimensions of the nanowires. The samples, after being covered with gold, were evaluated as surface-enhanced Raman scattering (SERS) substrates for detection of dye solutions and very good intensifications of the Raman signal were obtained. The SERS performance of the samples was also compared to that of a commercial SERS substrate and the results achieved were similar. To the best of our knowledge, this is the first time ITO nanowires were grown by the sputtering technique using oxide and metal targets

  11. Study of quartz crystal microbalance NO2 sensor coated with sputtered indium tin oxide film

    Science.gov (United States)

    Georgieva, V.; Aleksandrova, M.; Stefanov, P.; Grechnikov, A.; Gadjanova, V.; Dilova, T.; Angelov, Ts

    2014-12-01

    A study of NO2 gas sorption ability of thin indium tin oxide (ITO) deposited on 16 MHz quartz crystal microbalance (QCM) is presented. ITO films are grown by RF sputtering of indium/tin target with weight proportion 95:5 in oxygen environment. The ITO films have been characterized by X-ray photoelectron spectroscopy measurements. The ITO surface composition in atomic % is defined to be: In-40.6%, Sn-4.3% and O-55%. The thickness and refractive index of the films are determined by ellipsometric method. The frequency shift of QCM-ITO is measured at different NO2 concentrations. The QCM-ITO system becomes sensitive at NO2 concentration >= 500 ppm. The sorbed mass for each concentration is calculated according the Sauerbrey equation. The results indicated that the 1.09 ng of the gas is sorbed into 150 nm thick ITO film at 500 ppm NO2 concentration. When the NO2 concentration increases 10 times the calculated loaded mass is 5.46 ng. The sorption process of the gas molecules is defined as reversible. The velocity of sorbtion /desorption processes are studied, too. The QCM coated with thin ITO films can be successfully used as gas sensors for detecting NO2 in the air at room temperature.

  12. Structural and electrical properties of sputtering power and gas pressure on Ti-dope In2O3 transparent conductive films by RF magnetron sputtering

    Science.gov (United States)

    Chaoumead, Accarat; Joo, Bong-Hyun; Kwak, Dong-Joo; Sung, Youl-Moon

    2013-06-01

    Transparent conductive titanium-doped indium oxide (ITiO) films were deposited on Corning glass substrates by RF magnetron sputtering method. The effects of RF sputtering power and Ar gas pressure on the structural and electrical properties of the films were investigated experimentally, using a 2.5 wt% TiO2-doped In2O3 target. The deposition rate was in the range of around 20-60 nm/min under the experimental conditions of 5-20 mTorr of gas pressure and 220-350 W of RF power. The lowest resistivity of 1.2 × 10-4 Ω cm, the average optical transmittance of 75%, the high hall mobility of 47.03 cm2/V s and the relatively low carrier concentration of 1.15E+21 cm-3 were obtained for the ITiO film, prepared at RF power of 300 W and Ar gas pressure of 15 mTorr. This resistivity of 1.2 × 10-4 Ω cm is low enough as a transparent conducting layer in various electro-optical devices and it is comparable with that of ITO or ZnO:Al conducting layer.

  13. Study of quartz crystal microbalance NO2 sensor coated with sputtered indium tin oxide film

    International Nuclear Information System (INIS)

    Georgieva, V; Gadjanova, V; Angelov, Ts; Aleksandrova, M; Acad. Georgi Bonchev str.bl. 11, 1113, Sofia (Bulgaria))" data-affiliation=" (Institute of General and Inorganic Chemistry, Bulgarian Academy of Sciences, Acad. Georgi Bonchev str.bl. 11, 1113, Sofia (Bulgaria))" >Stefanov, P; Acad. Georgi Bonchev str.bl. 11, 1113, Sofia (Bulgaria))" data-affiliation=" (Institute of General and Inorganic Chemistry, Bulgarian Academy of Sciences, Acad. Georgi Bonchev str.bl. 11, 1113, Sofia (Bulgaria))" >Dilova, T; Grechnikov, A

    2014-01-01

    A study of NO 2 gas sorption ability of thin indium tin oxide (ITO) deposited on 16 MHz quartz crystal microbalance (QCM) is presented. ITO films are grown by RF sputtering of indium/tin target with weight proportion 95:5 in oxygen environment. The ITO films have been characterized by X-ray photoelectron spectroscopy measurements. The ITO surface composition in atomic % is defined to be: In-40.6%, Sn-4.3% and O-55%. The thickness and refractive index of the films are determined by ellipsometric method. The frequency shift of QCM-ITO is measured at different NO 2 concentrations. The QCM-ITO system becomes sensitive at NO 2 concentration ≥ 500 ppm. The sorbed mass for each concentration is calculated according the Sauerbrey equation. The results indicated that the 1.09 ng of the gas is sorbed into 150 nm thick ITO film at 500 ppm NO 2 concentration. When the NO 2 concentration increases 10 times the calculated loaded mass is 5.46 ng. The sorption process of the gas molecules is defined as reversible. The velocity of sorbtion /desorption processes are studied, too. The QCM coated with thin ITO films can be successfully used as gas sensors for detecting NO 2 in the air at room temperature

  14. Top-gate microcrystalline silicon TFTs processed at low temperature (<200 deg. C)

    International Nuclear Information System (INIS)

    Saboundji, A.; Coulon, N.; Gorin, A.; Lhermite, H.; Mohammed-Brahim, T.; Fonrodona, M.; Bertomeu, J.; Andreu, J.

    2005-01-01

    N-type as well P-type top-gate microcrystalline silicon thin film transistors (TFTs) are fabricated on glass substrates at a maximum temperature of 200 deg. C. The active layer is an undoped μc-Si film, 200 nm thick, deposited by Hot-Wire Chemical Vapor. The drain and source regions are highly phosphorus (N-type TFTs) or boron (P-type TFTs)-doped μc-films deposited by HW-CVD. The gate insulator is a silicon dioxide film deposited by RF sputtering. Al-SiO 2 -N type c-Si structures using this insulator present low flat-band voltage,-0.2 V, and low density of states at the interface D it =6.4x10 10 eV -1 cm -2 . High field effect mobility, 25 cm 2 /V s for electrons and 1.1 cm 2 /V s for holes, is obtained. These values are very high, particularly the hole mobility that was never reached previously

  15. Scanning microwave microscopy technique for nanoscale characterization of magnetic materials

    Energy Technology Data Exchange (ETDEWEB)

    Joseph, C.H., E-mail: hadlee.joseph@artov.imm.cnr.it [National Research Council, Institute for Microelectronics and Microsystems (CNR-IMM), Via del Fosso del Cavaliere 100, 00133 Rome (Italy); Department of Electronics Engineering, University of Rome “Tor Vergata”, Via del Politecnico 1, 00133 Rome (Italy); Sardi, G.M. [National Research Council, Institute for Microelectronics and Microsystems (CNR-IMM), Via del Fosso del Cavaliere 100, 00133 Rome (Italy); Tuca, S.S.; Gramse, G. [Johannes Kepler University, Institute for Biophysics, Gruberstrasse 40, A-4020 Linz (Austria); Lucibello, A.; Proietti, E. [National Research Council, Institute for Microelectronics and Microsystems (CNR-IMM), Via del Fosso del Cavaliere 100, 00133 Rome (Italy); Kienberger, F. [Keysight Technologies Austria GmbH, Keysight Laboratories, Gruberstrasse 40, A-4020 Linz (Austria); Marcelli, R. [National Research Council, Institute for Microelectronics and Microsystems (CNR-IMM), Via del Fosso del Cavaliere 100, 00133 Rome (Italy)

    2016-12-15

    In this work, microwave characterization of magnetic materials using the scanning microwave microscopy (SMM) technique is presented. The capabilities of the SMM are employed for analyzing and imaging local magnetic properties of the materials under test at the nanoscale. The analyses are performed by acquiring both amplitude and phase of the reflected microwave signal. The changes in the reflection coefficient S{sub 11} are related to the local properties of the material under investigation, and the changes in its magnetic properties have been studied as a function of an external DC magnetic bias. Yttrium iron garnet (YIG) films deposited by RF sputtering and grown by liquid phase epitaxial (LPE) on gadolinium gallium garnet (GGG) substrates and permalloy samples have been characterized. An equivalent electromagnetic transmission line model is discussed for the quantitative analysis of the local magnetic properties. We also observed the hysteretic behavior of the reflection coefficient S{sub 11} with an external bias field. The imaging and spectroscopy analysis on the experimental results are evidently indicating the possibilities of measuring local changes in the intrinsic magnetic properties on the surface of the material.

  16. Annealed silver-islands for enhanced optical absorption in organic solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Otieno, Francis, E-mail: frankotienoo@gmail.com [Material Physics Research Institute, School of Physics, University of the Witwatersrand, Private Bag 3, Wits, 2050Johannesburg (South Africa); Materials for Energy Research Group, University of the Witwatersrand, Private Bag 3, Wits, 2050 Johannesburg (South Africa); Airo, Mildred [School of Chemistry, University of the Witwatersrand, Private Bag 3, Wits, 2050 (South Africa); Ranganathan, Kamalakannan [School of Chemistry, University of the Witwatersrand, Private Bag 3, Wits, 2050 (South Africa); DST-NRF Centre of Strong Materials and the Molecular Sciences Institute, School of Chemistry, University of the Witwatersrand, 2193 Johannesburg (South Africa); Wamwangi, Daniel [Material Physics Research Institute, School of Physics, University of the Witwatersrand, Private Bag 3, Wits, 2050Johannesburg (South Africa); Materials for Energy Research Group, University of the Witwatersrand, Private Bag 3, Wits, 2050 Johannesburg (South Africa)

    2016-01-01

    Silver nano-islands are explored for enhancing optical absorption and photo-conversion efficiency in organic solar cells (OSCs) based on the surface plasmon resonance effect under diverse annealing conditions. Ag nano-islands have been deposited by RF magnetron sputtering at 15 W for 10 s and subsequently annealed between 100 °C–250 °C in air and Argon ambient. The optical properties of the reconstructed Ag islands demonstrate an increase and a blue shift in the absorption bands with increasing annealing temperature. This is the localized surface plasmon effect due to the Ag islands of diverse sizes, shapes and coverages. The increase in optical absorption with temperature is attributed to changes in island shape and density as collaborated by atomic force microscopy and TEM. As a proof of concept, an organic solar cell was characterized for current–voltage (I–V) measurements under dark and under solar simulated white light. Incorporation of annealed Ag islands has yielded an efficiency increment of between 4–24%. - Highlights: • RF Sputtering can be used to produce Ag NPs at low power. • Annealing enhances size, shape reconstruction as well as inter-particle separation. • Annealing in Argon ambient is more suitable than in air. • Ag NPs annealed at 250 °C enhances device absorption and PCE by up to 24%.

  17. Synthesis of Vertically Aligned Carbon Nanotubes on Silicalite-1 Monolayer-Supported Substrate

    Directory of Open Access Journals (Sweden)

    Wei Zhao

    2014-01-01

    Full Text Available Monodisperse magnetic Fe3O4 nanoparticles (NPs with the size of ca. 3.5 nm were prepared and used as the catalysts for the synthesis of vertically aligned carbon nanotube (VACNT arrays. A silicalite-1 microcrystal monolayer was used as the support layer between catalyst NPs and the silicon substrate. Compared to our previous report which used radio-frequency- (rf- sputtered Fe2O3 film as the catalyst, Fe3O4 NPs that were synthesized by wet chemical method showed an improved catalytic ability with less agglomeration. The silicalite-1 crystal monolayer acted as an effective “buffer” layer to prevent the catalyst NPs from agglomerating during the reaction process. It is believed that this is the first report that realizes the vertical alignment of CNTs over the zeolite monolayer, namely, silicalite-1 microcrystal monolayer, instead of using the intermediate anodic aluminum oxide (AAO scaffold to regulate the growth direction of CNT products.

  18. Synthesis and characterization of CdTe nanostructures grown by RF magnetron sputtering method

    Science.gov (United States)

    Akbarnejad, Elaheh; Ghoranneviss, Mahmood; Hantehzadeh, Mohammad Reza

    2017-08-01

    In this paper, we synthesize Cadmium Telluride nanostructures by radio frequency (RF) magnetron sputtering system on soda lime glass at various thicknesses. The effect of CdTe nanostructures thickness on crystalline, optical and morphological properties has been studied by means of X-ray diffraction (XRD), UV-VIS-NIR spectrophotometry, field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM), respectively. The XRD parameters of CdTe nanostructures such as microstrain, dislocation density, and crystal size have been examined. From XRD analysis, it could be assumed that increasing deposition time caused the formation of the wurtzite hexagonal structure of the sputtered films. Optical properties of the grown nanostructures as a function of film thickness have been observed. All the films indicate more than 60% transmission over a wide range of wavelengths. The optical band gap values of the films have obtained in the range of 1.62-1.45 eV. The results indicate that an RF sputtering method succeeded in depositing of CdTe nanostructures with high purity and controllable physical properties, which is appropriate for photovoltaic and nuclear detector applications.

  19. Defect induced modification of structural, topographical and magnetic properties of zinc ferrite thin films by swift heavy ion irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Raghavan, Lisha [Department of Physics, Cochin University of Science and Technology, Cochin 682022 (India); Inter University Accelerator Center, New Delhi 110067 (India); Joy, P.A. [National Chemical Laboratory, Pune (India); Vijaykumar, B. Varma; Ramanujan, R.V. [School of Materials Science and Engineering, Nanyang Technological University (Singapore); Anantharaman, M.R., E-mail: mraiyer@gmail.com [Department of Physics, Cochin University of Science and Technology, Cochin 682022 (India)

    2017-04-01

    Highlights: • Zinc ferrite films exhibited room temperature ferrimagnetic property. • On ion irradiation amorphisation of films were observed. • The surface morphology undergoes changes with ion irradiation. • The saturation magnetisation decreases on ion irradiation. - Abstract: Swift heavy ion irradiation provides unique ways to modify physical and chemical properties of materials. In ferrites, the magnetic properties can change significantly as a result of swift heavy ion irradiation. Zinc ferrite is an antiferromagnet with a Neel temperature of 10 K and exhibits anomalous magnetic properties in the nano regime. Ion irradiation can cause amorphisation of zinc ferrite thin films; thus the role of crystallinity on magnetic properties can be examined. The influence of surface topography in these thin films can also be studied. Zinc ferrite thin films, of thickness 320 nm, prepared by RF sputtering were irradiated with 100 MeV Ag ions. Structural characterization showed amorphisation and subsequent reduction in particle size. The change in magnetic properties due to irradiation was correlated with structural and topographical effects of ion irradiation. A rough estimation of ion track radius is done from the magnetic studies.

  20. Some metal oxides and their applications for creation of Microsystems (MEMS) and Energy Harvesting Devices (EHD)

    International Nuclear Information System (INIS)

    Denishev, K

    2016-01-01

    This is a review of a part of the work of the Technological Design Group at Technical University of Sofia, Faculty of Electronic Engineering and Technologies, Department of Microelectronics. It is dealing with piezoelectric polymer materials and their application in different microsystems (MEMS) and Energy Harvesting Devices (EHD), some organic materials and their applications in organic (OLED) displays, some transparent conductive materials etc. The metal oxides Lead Zirconium Titanate (PZT) and Zinc Oxide (ZnO) are used as piezoelectric layers - driving part of different sensors, actuators and EHD. These materials are studied in term of their performance in dependence on the deposition conditions and parameters. They were deposited as thin films by using RF Sputtering System. As technological substrates, glass plates and Polyethylenetherephtalate (PET) foils were used. For characterization of the materials, a test structure, based on Surface Acoustic Waves (SAW), was designed and prepared. The layers were characterized by Fourier Transform Infrared spectroscopy (FTIR). The piezoelectric response was tested at variety of mechanical loads (tensile strain, stress) in static and dynamic (multiple bending) mode. The single-layered and double-layered structures were prepared for piezoelectric efficiency increase. A structure of piezoelectric energy transformer is proposed and investigated. (paper)

  1. Microstructure and phase composition of sputter-deposited zirconia-yttria films

    International Nuclear Information System (INIS)

    Knoll, R.W.; Bradley, E.R.

    1983-11-01

    Thin ZrO 2 -Y 2 O 3 coatings ranging in composition from 3 to 15 mole % Y 2 O 3 were produced by rf sputter deposition. This composition range spanned the region on the equilibrium ZrO 2 -Y 2 O 3 phase diagram corresponding to partially stabilized zirconia (a mixture of tetragonal ZrO 2 and cubic solid solution). Microstructural characteristics and crystalline phase composition of as-deposited and heat treated films (1100 0 C and 1500 0 C) were determined by transmission electron microscopy (TEM) and by x-ray diffraction (XRD). Effects of substrate bias (0 approx. 250 volts), which induced ion bombardment of the film during growth, were also studied. The as-deposited ZrO 2 -Y 2 O 3 films were single phase over the composition range studied, and XRD data indicated considerable local atomic disorder in the lattice. Films produced at low bias contained intergranular voids, pronounced columnar growth, and porosity between columns. At high bias, the microstructure was denser, and films contained high compressive stress. After heat treatment, all deposits remained single phase, therefore a microstructure and precipitate distribution characteristic of toughened, partially stabilized zirconia appear to be difficult to achieve in vapor deposited zirconia coatings

  2. Nano-hardness estimation by means of Ar{sup +} ion etching

    Energy Technology Data Exchange (ETDEWEB)

    Bartali, R., E-mail: bartali@fbk.eu; Micheli, V.; Gottardi, G.; Vaccari, A.; Safeen, M.K.; Laidani, N.

    2015-08-31

    When the coatings are in nano-scale, the mechanical properties cannot be easily estimated by means of the conventional methods due to: tip shape, instrument resolution, roughness, and substrate effect. In this paper, we proposed a semi-empirical method to evaluate the mechanical properties of thin films based on the sputtering rate induced by bombardment of Ar{sup +} ion. The Ar{sup +} ion bombardment was induced by ion gun implemented in Auger electron spectroscopy (AES). This procedure has been applied on a series of coatings with different structure (carbon films) and a series of coating with a different density (ZnO thin films). The coatings were deposited on Silicon substrates by RF sputtering plasma. The results show that, as predicted by Insepov et al., there is a correlation between hardness and sputtering rate. Using reference materials and a simple power law equation the estimation of the nano-hardness using an Ar{sup +} beam is possible. - Highlights: • ZnO film and Carbon films were grown on silicon using PVD. • The growth temperature was room temperature. • The hardness of the coatings was estimated by means of nanoindentation. • Evaluation of resistance of materials to the mechanical damage induced by an Ar{sup +} ion gun (AES). • The hardness have been studied and a power law with the erosion rate has been found.

  3. Deposition of polymer films in low pressure reactive plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Biederman, H.

    1981-12-11

    Sputtering and plasma polymerization have found wide application as deposition techniques and have been extensively studied. R.f. sputtering of plastics, in particular of polytetrafluoroethylene, are discussed in the first part of this paper. In the second part, the general concept of plasma polymerization is considered and some examples of applications of plasma-polymerized films are presented. Special attention is paid to fluorocarbon and fluorochlorocarbon films. It has been suggested that these films could be used in thin film capacitors or as passivating layers for integrated circuits. In the optical field some of these films have been used as convenient moisture-resistant, protective and antireflecting coatings. Their mechanical properties have also been examined with the intention of using them for reducing surface friction. More recently some metals have been incorporated into fluorocarbon films to obtain layers with novel properties. Experiments in which films were prepared by the plasma polymerization of certain Freons are described. Some electrical and optical properties of these films are presented. High dielectric losses were obtained in a metal/film/metal sandwich configuration and the possible influence of ambient atmospheric effects on these measurements is discussed.

  4. FY 1992 report on the results of the R and D of advanced function creation processing technology. Development of technology to create high efficiency power generation use members; 1992 nendo senshin kino soshutsu kako gijutsu no kenkyu kaihatsu seika hokokusho. Kokoritsu hatsuden'yo buzai sosei gijutsu kaihatsu

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1993-03-01

    The paper described the FY 1992 results of the technology to create high efficiency power generation use members. To enhance characteristics of super-high property permanent magnet up to the theoretical level, the development was proposed of a technology to control the size/configuration of micro crystal phase in association with the crystallization of alloy amorphous. For the development of environmental purification use high functional catalysts, a refining method using laser excitation was studied. The observation was also made of molecular adsorption on the Pd thin film catalyst prepared by RF sputtering. The multi-source excitation plasma CVD was proposed which was film-formed by exciting plasma as raw gas independently for each component and supplying it to the substrate of which the periphery was separately controlled. The paper also described the development of technology for ion/light combined assist ultra-thin film production for development of gas turbine combustion sensor. The study was also made of the synthesis of higher-order structure controlled high functional organic materials using the electrode interface combined field which is composed of electrode reaction/high grade photon/extreme magnetic field. In the development of the higher-order structure control technology using the photon combined reaction field, studies were made of the photo reaction film formation technology, the basic film formation technology in the combined reaction field, and the molecular orientation technology. (NEDO)

  5. Electrochemical characterization of V{sub x}Nb{sub y}C{sub z}/Bi{sub x}Ti{sub y}O{sub z} coatings produced through thermo-reactive diffusion and the sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Castro H, S. A.; Alfonso, J. E.; Olaya, J. J., E-mail: jealfonso@unal.edu.co [Universidad Nacional de Colombia, Departamento de Fisica, Grupo de Ciencia de Materiales y Superficies, AA-14490 Bogota (Colombia)

    2016-11-01

    We present and experimental study of the structural evolution of a bilayer V{sub x}Nb{sub y}C{sub z}/Bi{sub x}Ti{sub y}O{sub z} coating produced via thermo-reactive diffusion (TRD) and the RF sputtering process on D-2 steel substrate. The TRD treatments were carried out in a molten mixture consisting of borax, ferro-niobium, ferro-vanadium, and aluminum, at 1313 K for 3 hours, using a resistance-heating furnace. Bi{sub x}Ti{sub y}O{sub z} coatings were deposited using RF magnetron sputtering on TRD coatings, in order to carry out a study of the corrosion behavior of this compound. The crystallographic structure of the coatings was determined via X-ray diffraction, the corrosion resistance was analyzed through the potentiodynamic polarization test (Tafel Extrapolation) and electrochemical impedance spectroscopic analysis (EIS). X-ray diffraction patterns showed that the ternary coating (VNbC{sub 2}) was preferentially oriented along the [200] direction with a cubic-centered face structure, and the Bi{sub x}Ti{sub y}O{sub z} coatings were amorphous. The electrochemical studies showed that the resistance corrosion of the coatings increased with respect to the bare substrate, and that polarization resistance in the bilayer coatings increased with respect to the ternary coatings, suggesting that the titanate has anti corrosive barrier effects. (Author)

  6. Glass-based confined structures enabling light control

    Energy Technology Data Exchange (ETDEWEB)

    Chiappini, Andrea; Normani, Simone; Chiasera, Alessandro [IFN–CNR CSMFO Lab., and FBK Photonics Unit via alla Cascata 56/C Povo, 38123 Trento (Italy); Lukowiak, Anna [Institute of Low Temperature and Structure Research PAS, Okolna St. 2, 50-422 Wroclaw (Poland); Vasilchenko, Iustyna [IFN–CNR CSMFO Lab., and FBK Photonics Unit via alla Cascata 56/C Povo, 38123 Trento (Italy); Dipartimento di Fisica, Università di Trento, via Sommarive 14 Povo, 38123Trento (Italy); Ristic, Davor [Institut Ruđer Bošković, Bijenička cesta 54, 10000 Zagreb (Croatia); Boulard, Brigitte [IMMM, CNRS Equipe Fluorures, Université du Maine, Av. Messiaen, 72085 Le Mans cedex 9 (France); Dorosz, Dominik [Department of Power Engineering, Photonics and Lighting Technology, Bialystok University of Technology, Wiejska Street 45D, 15-351 Bialystok (Poland); Scotognella, Francesco [Center for Nano Science and Technology@PoliMi, Istituto Italiano di Tecnologia, Via Giovanni Pascoli, 70/3, 20133, Milan (Italy); Politecnico di Milano, Dipartimento di Fisica and Istituto di Fotonica e Nanotecnologie CNR, Piazza Leonardo da Vinci 32, 20133 Milano (Italy); Vaccari, Alessandro [FBK -CMM, ARES Unit, 38123 Trento (Italy); Taccheo, Stefano [College of Engineering, Swansea University, Singleton Park, SA2 8PP, Swansea (United Kingdom); Pelli, Stefano; Righini, Giancarlo C. [IFAC - CNR, MiPLab., 50019 Sesto Fiorentino (Italy); Museo Storico della Fisica e Centro di Studi e Ricerche “Enrico Fermi”, Piazza del Viminale 1, 00184 Roma (Italy); Conti, Gualtiero Nunzi [IFAC - CNR, MiPLab., 50019 Sesto Fiorentino (Italy); Ramponi, Roberta [Politecnico di Milano, Dipartimento di Fisica and Istituto di Fotonica e Nanotecnologie CNR, Piazza Leonardo da Vinci 32, 20133 Milano (Italy); and others

    2015-04-24

    When a luminescent ion is confined in a system characterized by one or more specific properties such as spatial size, geometrical dimension and shape, refractive index, local crystal field, cut-off vibrational energy and so on, it's possible to control its emission. The control of branching ratios as a function of the composition, the luminescence enhancement induced by a photonic crystal, or the laser action in a microresonator, are well known examples of light control. Photonic glass-based structures are extremely viable systems to exploit the above mentioned properties and in our research team we have successfully fabricated luminescent photonic structures by different techniques, including sol-gel, rf sputtering, drawing, melting, and physical vapour deposition. Here we will discuss some of them with the aim to make the reader aware of the chemical-physical properties related to each specific system. We will demonstrate that glass ceramic waveguides in some cases present superior spectroscopic properties in respect to the parent glass, that compositional properties can play a positive role in reducing luminescence quenching and in developing novel planar waveguides and fibers, that colloids allow to obtain high internal quantum efficiency and that photonic crystals, microcavities and microresonators can enable the handling of the rare earth luminescence. Finally, the pros and cons of the systems and of the different techniques employed for their fabrication will be discussed and some perspectives concerning the glass photonics will be proposed looking at both possible applications and investigation of physical properties.

  7. Characterization of sputter deposited thin film scandate cathodes for miniaturized thermionic converter applications

    Science.gov (United States)

    Zavadil, Kevin R.; Ruffner, Judith H.; King, Donald B.

    1999-01-01

    We have successfully developed a method for fabricating scandate-based thermionic emitters in thin film form. The primary goal of our effort is to develop thin film emitters that exhibit low work function, high intrinsic electron emissivity, minimum thermal activation properties and that can be readily incorporated into a microgap converter. Our approach has been to incorporate BaSrO into a Sc2O3 matrix using rf sputtering to produce thin films. Diode testing has shown the resulting films to be electron emissive at temperatures as low as 900 K with current densities of 0.1 mA.cm-2 at 1100 K and saturation voltages. We calculate an approximate maximum work function of 1.8 eV and an apparent emission constant (Richardson's constant, A*) of 36 mA.cm-2.K-2. Film compositional and structural analysis shows that a significant surface and subsurface alkaline earth hydroxide phase can form and probably explains the limited utilization and stability of Ba and its surface complexes. The flexibility inherent in sputter deposition suggests alternate strategies for eliminating undesirable phases and optimizing thin film emitter properties.

  8. Electrical properties of radio-frequency sputtered HfO{sub 2} thin films for advanced CMOS technology

    Energy Technology Data Exchange (ETDEWEB)

    Sarkar, Pranab Kumar; Roy, Asim, E-mail: 28.asim@gmail.com [Department of Physics, National Institute of Technology Silchar, Silchar-788010, Assam, India Phone: +91-3842-224879 (India)

    2015-08-28

    The Hafnium oxide (HfO{sub 2}) high-k thin films have been deposited by radio frequency (rf) sputtering technique on p-type Si (100) substrate. The thickness, composition and phases of films in relation to annealing temperatures have been investigated by using cross sectional FE-SEM (Field Emission Scanning Electron Microscope) and grazing incidence x-ray diffraction (GI-XRD), respectively. GI-XRD analysis revealed that at annealing temperatures of 350°C, films phases change to crystalline from amorphous. The capacitance-voltage (C-V) and current-voltage (I-V) characteristics of the annealed HfO{sub 2} film have been studied employing Al/HfO{sub 2}/p-Si metal–oxide–semiconductor (MOS) structures. The electrical properties such as dielectric constant, interface trap density and leakage current density have been also extracted from C-V and I-V Measurements. The value of dielectric constant, interface trap density and leakage current density of annealed HfO{sub 2} film is obtained as 23,7.57×1011eV{sup −1} cm{sup −2} and 2.7×10{sup −5} Acm{sup −2}, respectively. In this work we also reported the influence of post deposition annealing onto the trapping properties of hafnium oxide and optimized conditions under which no charge trapping is observed into the dielectric stack.

  9. Cation disorder and gas phase equilibrium in an YBa 2Cu 3O 7- x superconducting thin film

    Science.gov (United States)

    Shin, Dong Chan; Ki Park, Yong; Park, Jong-Chul; Kang, Suk-Joong L.; Yong Yoon, Duk

    1997-02-01

    YBa 2Cu 3O 7- x superconducting thin films have been grown by in situ off-axis rf sputtering with varying oxygen pressure, Ba/Y ratio in a target, and deposition temperature. With decreasing oxygen pressure, increasing Ba/Y ratio, increasing deposition temperature, the critical temperature of the thin films decreased and the c-axis length increased. The property change of films with the variation of deposition variables has been explained by a gas phase equilibrium of the oxidation reaction of Ba and Y. Applying Le Chatelier's principle to the oxidation reaction, we were able to predict the relation of deposition variables and the resultant properties of thin films; the prediction was in good agreement with the experimental results. From the relation between the three deposition variables and gas phase equilibrium, a 3-dimensional processing diagram was introduced. This diagram has shown that the optimum deposition condition of YBa 2Cu 3O 7- x thin films is not a fixed point but can be varied. The gas phase equilibrium can also be applied to the explanation of previous results that good quality films were obtained at low deposition temperature using active species, such as O, O 3, and O 2+.

  10. Realization of ultrathin silver layers in highly conductive and transparent zinc tin oxide/silver/zinc tin oxide multilayer electrodes deposited at room temperature for transparent organic devices

    Energy Technology Data Exchange (ETDEWEB)

    Winkler, Thomas; Schmidt, Hans; Fluegge, Harald; Nikolayzik, Fabian; Baumann, Ihno; Schmale, Stephan; Johannes, Hans-Hermann; Rabe, Torsten [Institut fuer Hochfrequenztechnik, Technische Universitaet Braunschweig, Schleinitzstr. 22, 38106 Braunschweig (Germany); Hamwi, Sami, E-mail: sami.hamwi@ihf.tu-bs.de [Institut fuer Hochfrequenztechnik, Technische Universitaet Braunschweig, Schleinitzstr. 22, 38106 Braunschweig (Germany); Riedl, Thomas [Institute of Electronic Devices, Bergische Universitaet Wuppertal, Rainer-Gruenter Str. 21, 42119 Wuppertal (Germany); Kowalsky, Wolfgang [Institut fuer Hochfrequenztechnik, Technische Universitaet Braunschweig, Schleinitzstr. 22, 38106 Braunschweig (Germany)

    2012-05-01

    We report on transparent and highly conductive multilayer electrodes prepared at room temperature by RF sputtering of zinc tin oxide (ZTO) and thermal evaporation of ultrathin silver (Ag) as top contact for transparent organic light emitting diodes (TOLED). Specifically, we study the morphological, electrical and optical properties of the multilayer structure in particular of the thin Ag film. The tendency of Ag to form agglomerates over time on top of ZTO is shown by atomic force microscopy. From the optical constants derived from ellipsometric measurements we evidenced a bulk like behavior of an Ag film with a thickness of 8 nm embedded in ZTO leading to a low sheet resistance of 9 {Omega}/sq. Furthermore we verify the optical constants by simulation of an optimized ZTO/Ag/ZTO structure. As an application we present a highly efficient TOLED providing a device transmittance of > 82% in the visible part of the spectrum. The TOLED shows no damage caused by sputtering on a lighting area of 80 mm{sup 2} and exhibits efficiencies of 43 cd/A and 36 lm/W.

  11. ZnO-Based Microfluidic pH Sensor: A Versatile Approach for Quick Recognition of Circulating Tumor Cells in Blood.

    Science.gov (United States)

    Mani, Ganesh Kumar; Morohoshi, Madoka; Yasoda, Yutaka; Yokoyama, Sho; Kimura, Hiroshi; Tsuchiya, Kazuyoshi

    2017-02-15

    The present study is concerned about the development of highly sensitive and stable microfluidic pH sensor for possible identification of circulating tumor cells (CTCs) in blood. The precise pH measurements between silver-silver chloride (Ag/AgCl) reference electrode and zinc oxide (ZnO) working electrode have been investigated in the microfluidic device. Since there is a direct link between pH and cancer cells, the developed device is one of the valuable tools to examine circulating tumor cells (CTCs) in blood. The ZnO-based working electrode was deposited by radio frequency (rf) sputtering technique. The potential voltage difference between the working and reference electrodes (Ag/AgCl) is evaluated on the microfluidic device. The ideal Nernstian response of -43.71165 mV/pH was achieved along with high stability and quick response time. Finally, to evaluate the real time capability of the developed microfluidic device, in vitro testing was done with A549, A7r5, and MDCK cells.

  12. Neutron optics with multilayer monochromators

    International Nuclear Information System (INIS)

    Saxena, A.M.; Majkrzak, C.F.

    1984-01-01

    A multilayer monochromator is made by depositing thin films of two materials in an alternating sequence on a glass substrate. This makes a multilayer periodic in a direction perpendicular to the plane of the films, with a d-spacing equal to the thickness of one bilayer. Neutrons of wavelength λ incident on a multilayer will be reflected at an angle phi given by the Bragg relation nλ = 2d sinphi, where n is the order of reflection. The use of thin-film multilayers for monochromating neutrons is discussed. Because of the low flux of neutrons, the samples have to be large, and the width of the incident beam can be as much as 2 cm. Multilayers made earlier were fabricated by resistive heating of the materials in a vacuum chamber. Because of geometrical constraints imposed by the size of the vacuum chamber, limits on the amount of material that can be loaded in a boat, and finite life of the boats, this method of preparation limits the length of a multilayer to ∼ 15 cm and the total number of bilayers in a multilayer to about 200. This paper discusses a thin-film deposition system using RF sputtering for depositing films

  13. Study of annealing effect on the growth of ZnO nanorods on ZnO seed layers

    Science.gov (United States)

    Sannakashappanavar, Basavaraj S.; Pattanashetti, Nandini A.; Byrareddy, C. R.; Yadav, Aniruddh Bahadur

    2018-04-01

    A zinc oxide (ZnO) seed layer was deposited on the SiO2/Si substrate by RF sputtering. To study the effect of annealing, the seed layers were classified into annealed and unannealed thin films. Annealing of the seed layers was carried at 450°C. Surface morphology of the seed layers were studied by Atomic force microscopy. ZnO nanorods were then grown on both the types of seed layer by hydrothermal method. The morphology and the structural properties of the nanorods were characterized by X-ray diffraction and Scanning electron microscopy. The effect of seed layer annealing on the growth and orientation of the ZnO nanorods were clearly examined on comparing with the nanorods grown on unannealed seed layer. The nanorods grown on annealed seed layers were found to be well aligned and oriented. Further, the I-V characteristic study was carried out on these aligned nanorods. The results supports positively for the future work to further enhance the properties of developed nanorods for their wide applications in electronic and optoelectronic devices.

  14. Sputtered Encapsulation as Wafer Level Packaging for Isolatable MEMS Devices: A Technique Demonstrated on a Capacitive Accelerometer

    Directory of Open Access Journals (Sweden)

    Azrul Azlan Hamzah

    2008-11-01

    Full Text Available This paper discusses sputtered silicon encapsulation as a wafer level packaging approach for isolatable MEMS devices. Devices such as accelerometers, RF switches, inductors, and filters that do not require interaction with the surroundings to function, could thus be fully encapsulated at the wafer level after fabrication. A MEMSTech 50g capacitive accelerometer was used to demonstrate a sputtered encapsulation technique. Encapsulation with a very uniform surface profile was achieved using spin-on glass (SOG as a sacrificial layer, SU-8 as base layer, RF sputtered silicon as main structural layer, eutectic gold-silicon as seal layer, and liquid crystal polymer (LCP as outer encapsulant layer. SEM inspection and capacitance test indicated that the movable elements were released after encapsulation. Nanoindentation test confirmed that the encapsulated device is sufficiently robust to withstand a transfer molding process. Thus, an encapsulation technique that is robust, CMOS compatible, and economical has been successfully developed for packaging isolatable MEMS devices at the wafer level.

  15. Hydrogenated amorphous silicon thin film anode for proton conducting batteries

    Science.gov (United States)

    Meng, Tiejun; Young, Kwo; Beglau, David; Yan, Shuli; Zeng, Peng; Cheng, Mark Ming-Cheng

    2016-01-01

    Hydrogenated amorphous Si (a-Si:H) thin films deposited by chemical vapor deposition were used as anode in a non-conventional nickel metal hydride battery using a proton-conducting ionic liquid based non-aqueous electrolyte instead of alkaline solution for the first time, which showed a high specific discharge capacity of 1418 mAh g-1 for the 38th cycle and retained 707 mAh g-1 after 500 cycles. A maximum discharge capacity of 3635 mAh g-1 was obtained at a lower discharge rate, 510 mA g-1. This electrochemical discharge capacity is equivalent to about 3.8 hydrogen atoms stored in each silicon atom. Cyclic voltammogram showed an improved stability 300 mV below the hydrogen evolution potential. Both Raman spectroscopy and Fourier transform infrared spectroscopy studies showed no difference to the pre-existing covalent Si-H bond after electrochemical cycling and charging, indicating a non-covalent nature of the Si-H bonding contributing to the reversible hydrogen storage of the current material. Another a-Si:H thin film was prepared by an rf-sputtering deposition followed by an ex-situ hydrogenation, which showed a discharge capacity of 2377 mAh g-1.

  16. Polycrystalline GaN layer recrystallization by metal-induced method during the baking process

    Energy Technology Data Exchange (ETDEWEB)

    Jagoda, A.; Stanczyk, B.; Dobrzanski, L.; Diduszko, R. [Institute of Electronic Materials Technology, Wolczynska 133, 01-919 Warsaw 118 (Poland)

    2007-04-15

    Radio frequency reactive sputtering was used to produce gallium nitride films on thermally oxidized silicon substrates at room temperature. Metallic Ga (purity 6N) was used as the target, N{sub 2} and Ar were utilized as sputtering gases. Amorphous GaN was obtained by metal-induced crystallization with a Ni assistance. The nickel particles were scattered onto the surface by rf sputtering and their density was 2 x 10{sup 14} atoms/cm{sup 2} or 4 x 10{sup 14} atoms/cm{sup 2}, which corresponds to 0.02 nm and 0.04 nm thick layer. These values are less than a monolayer thickness, so they are not continuous. Samples were annealed at 700 C for 3 h and at 900 C for 5 min in a RTP furnace. The 2.5 {mu}m GaN layers grown on the Ni-coated SiO{sub 2} surface recrystallized during annealing forming crystals of (002) orientation. The catalytic regrowth mechanism of GaN is discussed on the basis of experimental results. (copyright 2007 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  17. Study of structural and transport properties of nanostructured CeO{sub 2}, Ce{sub 1-x}Ru{sub x}O{sub 2} and Ce{sub 1-x}In{sub x}O{sub 2} thin films

    Energy Technology Data Exchange (ETDEWEB)

    Rangel, R.; Chavez-Chavez, L. [Division de Estudios de Posgrado, Facultad de Ingenieria Quimica, Universidad Michoacana de S.N.H. (Mexico); Martinez, E. [Centro de Investigacion en Materiales Avanzados, S.C. (CIMAV), Nuevo Leon (Mexico); Bartolo-Perez, P. [Departamento de Fisica Aplicada, CINVESTAV-IPN, Merida, Yucatan (Mexico)

    2012-06-15

    The present work reports for the first time thin films prepared from Ce{sub 1-x}M{sub x}O{sub 2-{delta}} (M = Ru, In) solid solutions for application as gas sensors. The CeO{sub 2}, Ce{sub 0.95}Ru{sub 0.05}O{sub 2} and Ce{sub 0.95}In{sub 0.05}O{sub 2} thin films were prepared by means of the RF sputtering process onto Si (111) substrates. The deposition conditions were carried out at 500 C varying the deposition time. Targets were prepared via sol-gel process starting from C{sub 6}H{sub 9}O{sub 6}In, Ru{sub 3}(CO){sub 12} and Ce(C{sub 2}H{sub 3}O{sub 2}){sub 3} . 1.5H{sub 2}O compounds and using a ceramic method to consolidate them. The samples were characterized by means of XRD, SEM, and AFM. Their thickness was measured using a profilometer. The results herein obtained regarding the microstructure and transport properties indicate that these materials can be used as gas sensors. (Copyright copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  18. Nano tubular Transition Metal Oxide for Hydrogen Production

    International Nuclear Information System (INIS)

    Sreekantan, S.; San, E.P.; Kregvirat, W.; Wei, L.C.

    2011-01-01

    TiO 2 , transition metal oxide nano tubes were successfully grown by anodizing of titanium foil (Ti) in ethylene glycol electrolyte containing 5wt. % hydrogen peroxide and 5wt. % ammonium fluoride for 60 minutes at 60V. It was found such electrochemical condition resulted in the formation of nano tube with average diameter of 90nm and length of 6.6 μm. These samples were used to study the effect of W loading by RF sputtering on TiO 2 nano tubes. Amorphous TiO 2 nano tube substrate leads to enhance incorporation of W instead of anatase. Therefore for the entire study, W was sputtered on amorphous TiO 2 nano tube substrate. TiO 2 nano tube sputtered for 1 minute resulted in the formation of W-O-Ti while beyond this point (10 minutes); it accumulates to form a self independent structure of WO 3 on the surface of the nano tubes. TiO 2 nano tube sputtered for 1 minute at 150 W and annealed at 450 degree Celsius exhibited best photocurrent density (1.4 mA/ cm 2 ) with photo conversion efficiency of 2.5 %. The reason for such behavior is attributed to W 6+ ions allows for electron traps that suppress electron hole recombination and exploit the lower band gap of material to produce a water splitting process by increasing the charge separation and extending the energy range of photoexcitation for the system. (author)

  19. Effects of oxygen partial pressure and annealing temperature on the residual stress of hafnium oxide thin-films on silicon using synchrotron-based grazing incidence X-ray diffraction

    Energy Technology Data Exchange (ETDEWEB)

    Biswas, Debaleen [Saha Institute of Nuclear Physics, 1/AF Bidhannagar, Kolkata 700 064 (India); Sinha, Anil Kumar [ISU, Raja Ramanna Centre for Advanced Technology, Indore 452 013 (India); Homi Bhabha National Institute, BARC, Mumbai 400 094 (India); Chakraborty, Supratic, E-mail: supratic.chakraborty@saha.ac.in [Saha Institute of Nuclear Physics, 1/AF Bidhannagar, Kolkata 700 064 (India)

    2016-10-30

    Highlights: • Residual stress estimation thin hafnium oxide film with thickness of <10 nm. • A mathematical expression is proposed for stress estimation of thin-film using GIXRD. • Residual stress varies with argon content in Ar/O{sub 2} plasma and annealing temperature. • Variation of stress is explained by IL swelling and enhanced structural relaxation. - Abstract: Synchrotron radiation-based grazing incidence X-ray diffraction (GI-XRD) technique is employed here to estimate the residual stress of < 10 nm thin hafnium oxide film deposited on Si (100) substrate at different argon/oxygen ratios using reactive rf sputtering. A decrease in residual stress, tensile in nature, is observed at higher annealing temperature for the samples deposited with increasing argon ratio in the Ar/O{sub 2} plasma. The residual stress of the films deposited at higher p{sub Ar} (Ar:O{sub 2} = 4:1) is also found to be decreased with increasing annealing temperature. But the stress is more or less constant with annealing temperature for the films deposited at lower Ar/O{sub 2} (1:4) ratio. All the above phenomena can be explained on the basis of swelling of the interfacial layer and enhanced structural relaxation in the presence of excess Hf in hafnium oxide film during deposition.

  20. Initial growth and texture formation during reactive magnetron sputtering of TiN on Si(111)

    CERN Document Server

    Li, T Q; Tsuji, Y; Ohsawa, T; Komiyama, H

    2002-01-01

    The initial growth and texture formation mechanism of titanium nitride (TiN) films were investigated by depositing TiN films on (111) silicon substrates by using reactive magnetron sputtering of a Ti metallic target under a N sub 2 /Ar atmosphere, and then analyzing the films in detail by using transmission electron microscopy (TEM) and x-ray diffraction (XRD). Two power sources for the sputtering, dc and rf, were compared. At the initial growth stage, a continuous amorphous film containing randomly oriented nuclei was observed when the film thickness was about 3 nm. The nuclei grew and formed a polycrystalline layer when the film thickness was about 6 nm. As the film grew further, its orientation changed depending on the deposition conditions. For dc sputtering, the appearance of (111) or (200)-preferred orientations depended on the N sub 2 partial pressure, and the intensity of the preferred orientation increased with increasing film thickness. For rf sputtering, however, when the film thickness was small (...

  1. Structural and photoluminescence characterization of vertically aligned multiwalled carbon nanotubes coated with ZnO by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Ouldhamadouche, N. [Institut des Materiaux Jean Rouxel, Universite de Nantes, CNRS, 2 rue de la Houssiniere BP 32229 44322 Nantes cedex 3 (France); Laboratoire de Physique des Materiaux, Universite des Sciences et de la Technologie Houari Boumediene, BP 32 El Alla. 16111, Bab Ezzouaur (Algeria); Achour, A., E-mail: a_aminph@yahoo.fr [Institut des Materiaux Jean Rouxel, Universite de Nantes, CNRS, 2 rue de la Houssiniere BP 32229 44322 Nantes cedex 3 (France); Musa, I.; Ait Aissa, K.; Massuyeau, F.; Jouan, P.Y. [Institut des Materiaux Jean Rouxel, Universite de Nantes, CNRS, 2 rue de la Houssiniere BP 32229 44322 Nantes cedex 3 (France); Kechouane, M. [Laboratoire de Physique des Materiaux, Universite des Sciences et de la Technologie Houari Boumediene, BP 32 El Alla. 16111, Bab Ezzouaur (Algeria); Le Brizoual, L.; Faulques, E.; Barreau, N.; Djouadi, M.A. [Institut des Materiaux Jean Rouxel, Universite de Nantes, CNRS, 2 rue de la Houssiniere BP 32229 44322 Nantes cedex 3 (France)

    2012-05-01

    Zinc oxide (ZnO) nanostructures are very attractive in various optoelectronic applications such as light emitting devices. A fabrication process of these ZnO nanostructures which gives a good crystalline quality and being compatible with that of micro-fabrication has significant importance for practical application. In this work ZnO films with different thicknesses were deposited by RF-sputtering on vertically aligned multiwalled carbon nanotube (MWCNTs) template in order to obtain ZnO nanorods. The obtained hybrid structures (ZnO/MWCNTs) were characterized by scanning electron microscopy, X-ray diffraction, transmission electron microscopy, and time resolved photoluminescence spectroscopy (PL). Results show that the ZnO/MWCNTs have a nanorod structure like morphology with a good crystalline quality of the deposited ZnO on the MWCNTs. PL measurements reveal an enhancement of the band edge signal of ZnO/MWCNTs which is three times of magnitude higher compared to the ZnO film deposited on silicon. Moreover, the intensity enhancement varies as function of the ZnO thickness. Such hybrid structures are promising for optoelectronic application, such as blue-violet sources.

  2. New Sunshine Project FY 1996 report on the results of development of photovoltaic power generation system commercialization technologies. Research on commercialization of the technologies for production of thin-film photovoltaic cells (Development of fabrication technologies of high-quality CuInSe{sub 2}-based thin-film solar cells); 1996 nendo taiyoko hatsuden system jitsuyoka gijutsu kaihatsu seika hokokusho. Usumaku taiyo denchi seizo gijutsu no jitsuyoka kenkyu (kohinshitsuka gijutsu (CuInSe{sub 2} taiyo denchi seizo no gijutsu kaihatsu))

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1997-03-01

    Described herein are the FY 1996 results of development of fabrication technologies for high-quality CuInSe{sub 2}-based photovoltaic cells. The Cu-Ga alloy/In-stacked precursor film is prepared for production of the high-quality thin-film absorber applicable to large-area module fabrication, and selenized by the vapor-phase selenization in a H{sub 2}Se gas atmosphere to produce the thin light-absorbing film in which In and Ga are present at graded concentrations. Increasing Ga alloy content in the CIGS-based thin-film photovoltaic cell fails to widen the forbidden band and improve V{sub oc}, and further optimization works are needed. The method is developed for production of thin-film buffer layer of sulfur-containing Zn compound which can give the cell characteristics equivalent to those of CdS generally used for CIS-based thin-film photovoltaic cell. It is clarified that the photovoltaic cell characteristics can be improved by use of a transparent electroconductive ZnO film of stacked structure, produced by a combination of RF sputtering and DC sputtering. For the patterning technologies necessary for forming series connection on a mini-module, the laser scribing method is applicable to the metal base-electrode, and the mechanical scribing method to the light absorber and window layer. (NEDO)

  3. Enhanced Visible Transmittance of Thermochromic VO2 Thin Films by SiO2 Passivation Layer and Their Optical Characterization

    Directory of Open Access Journals (Sweden)

    Jung-Hoon Yu

    2016-07-01

    Full Text Available This paper presents the preparation of high-quality vanadium dioxide (VO2 thermochromic thin films with enhanced visible transmittance (Tvis via radio frequency (RF sputtering and plasma enhanced chemical vapor deposition (PECVD. VO2 thin films with high Tvis and excellent optical switching efficiency (Eos were successfully prepared by employing SiO2 as a passivation layer. After SiO2 deposition, the roughness of the films was decreased 2-fold and a denser structure was formed. These morphological changes corresponded to the results of optical characterization including the haze, reflectance and absorption spectra. In spite of SiO2 coating, the phase transition temperature (Tc of the prepared films was not affected. Compared with pristine VO2, the total layer thickness after SiO2 coating was 160 nm, which is an increase of 80 nm. Despite the thickness change, the VO2 thin films showed a higher Tvis value (λ 650 nm, 58% compared with the pristine samples (λ 650 nm, 43%. This enhancement of Tvis while maintaining high Eos is meaningful for VO2-based smart window applications.

  4. Highly conformal SiO2/Al2O3 nanolaminate gas-diffusion barriers for large-area flexible electronics applications

    International Nuclear Information System (INIS)

    Choi, Jin-Hwan; Kim, Young-Min; Park, Young-Wook; Park, Tae-Hyun; Jeong, Jin-Wook; Choi, Hyun-Ju; Song, Eun-Ho; Ju, Byeong-Kwon; Lee, Jin-Woo; Kim, Cheol-Ho

    2010-01-01

    The present study demonstrates a flexible gas-diffusion barrier film, containing an SiO 2 /Al 2 O 3 nanolaminate on a plastic substrate. Highly uniform and conformal coatings can be made by alternating the exposure of a flexible polyethersulfone surface to vapors of SiO 2 and Al 2 O 3 , at nanoscale thickness cycles via RF-magnetron sputtering deposition. The calcium degradation test indicates that 24 cycles of a 10/10 nm inorganic bilayer, top-coated by UV-cured resin, greatly enhance the barrier performance, with a permeation rate of 3.79 x 10 -5 g m -2 day -1 based on the change in the ohmic behavior of the calcium sensor at 20 deg. C and 50% relative humidity. Also, the permeation rate for 30 cycles of an 8/8 nm inorganic bilayer coated with UV resin was beyond the limited measurable range of the Ca test at 60 deg. C and 95% relative humidity. It has been found that such laminate films can effectively suppress the void defects of a single inorganic layer, and are significantly less sensitive against moisture permeation. This nanostructure, fabricated by an RF-sputtering process at room temperature, is verified as being useful for highly water-sensitive organic electronics fabricated on plastic substrates.

  5. Frequency characterization of thin soft magnetic material layers used in spiral inductors

    International Nuclear Information System (INIS)

    Kriga, Adoum; Allassem, Désiré; Soultan, Malloum; Chatelon, Jean-Pierre; Siblini, Ali; Allard, Bruno; Rousseau, Jean Jacques

    2012-01-01

    The paper details the characterization of thin magnetic materials layers, particularly soft materials, with respect to their behaviour in frequency (from 10 MHz to 1 GHz). The proposed method is suitable for any soft but insulating magnetic material; Yttrium Iron Garnet (YIG) is used as an example. The principle is based on a comparison between simulations for different values of the permeability and measurement values versus frequency of planar inductor structures; an experimental validation is proposed as well. Thin magnetic material is first deposited on an alumina substrate using RF sputtering technique; a planar spiral winding of copper is then deposited on the magnetic material by the same technique. The effective permeability versus frequency is obtained by comparing two samples of spiral windings with and without magnetic material. Network analyser measurements on samples of various geometrical dimensions and of different thicknesses are necessary to determine the effective magnetic permeability; we have obtained a relative effective permeability of about 30 for seven turns spiral inductor of a 17 μm YIG film. - Highlights: ► A simple and original method is presented for the characterization of soft magnetic layer. ► This is a non-destructive method based on standard equipment. ► The principle is based on a comparison between simulations and measurement. ► An experimental validation is proposed as well.

  6. Physical vapor deposition of cubic boron nitride thin films

    International Nuclear Information System (INIS)

    Kester, D.J.

    1991-01-01

    Cubic boron nitride was successfully deposited using physical vapor-deposition methods. RF-sputtering, magnetron sputtering, dual-ion-beam deposition, and ion-beam-assisted evaporation were all used. The ion-assisted evaporation, using boron evaporation and bombardment by nitrogen and argon ions, led to successful cubic boron nitride growth over the widest and most controllable range of conditions. It was found that two factors were important for c-BN growth: bombardment of the growing film and the presence of argon. A systematic study of the deposition conditions was carried out. It was found that the value of momentum transferred into the growing from by the bombarding ions was critical. There was a very narrow transition range in which mixed cubic and hexagonal phase films were prepared. Momentum-per-atom value took into account all the variables involved in ion-assisted deposition: deposition rate, ion energy, ion flux, and ion species. No other factor led to the same control of the process. The role of temperature was also studied; it was found that at low temperatures only mixed cubic and hexagonal material are deposited

  7. Effects of phosphorus doping by plasma immersion ion implantation on the structural and optical characteristics of Zn0.85Mg0.15O thin films

    International Nuclear Information System (INIS)

    Saha, S.; Nagar, S.; Chakrabarti, S.

    2014-01-01

    ZnMgO thin films deposited on 〈100〉 Si substrates by RF sputtering were annealed at 800, 900, and 1000 °C after phosphorus plasma immersion ion implantation. X-ray diffraction spectra confirmed the presence of 〈101 ¯ 0〉 and 〈101 ¯ 3〉 peaks for all the samples. However, in case of the annealed samples, the 〈0002〉 peak was also observed. Scanning electron microscopy images revealed the variation in surface morphology caused by phosphorus implantation. Implanted and non-implanted samples were compared to examine the effects of phosphorus implantation on the optical properties of ZnMgO. Optical characteristics were investigated by low-temperature (15 K) photoluminescence experiments. Inelastic exciton–exciton scattering and localized, and delocalized excitonic peaks appeared at 3.377, 3.42, and 3.45 eV, respectively, revealing the excitonic effect resulting from phosphorus implantation. This result is important because inelastic exciton–exciton scattering leads to nonlinear emission, which can improve the performance of many optoelectronic devices

  8. Influence of post-treatment on properties of Cu(In{sub ,}Ga)Se{sub 2} thin films deposited by RF magnetron sputtering using a quaternary single target for photovoltaic devices

    Energy Technology Data Exchange (ETDEWEB)

    Jung, Sung Hee; Choi, Soon Ja; Chung, Chee Won, E-mail: cwchung@inha.ac

    2014-11-03

    The deposition of Cu(In,Ga)Se{sub 2} (CIGS) thin films has been performed by one-step RF sputtering using a single quaternary target and followed by sulfurization to incorporate S into CIGS films. The effect of sulfurization temperature and time on the properties of the films was studied. The sulfurized Cu(In,Ga)(Se,S){sub 2} (CIGSeS) films show that the chalcopyrite peaks shifted to high diffraction angles and the CuS and InS second phases could be formed at low sulfurization temperature. These indicate possible incorporation of S into the films. The formation and disappearance of these second phases depended on the sulfurization temperature and time. The band gap increased with increasing sulfurization temperature and time because of the shift of the absorption edge due to the increase of S/(S + Se) ratio. It was revealed that the resistivity of the as-deposited CIGS film increased after sulfurization while the carrier concentration and mobility decreased. It is believed that the sulfurization process of CIGS films can be utilized as a method to control the properties of the films. - Highlights: • Development of sputtering process of CIGS thin films using single quaternary target • Effect of sulfurization temperature and time on the properties of CIGS films • Application of sulfurization process to improve the properties of CIGS films • Successful transformation of CIGS films to chalcopyrite structure through post-sulfirization.

  9. Improvement of the homogeneity of high mobility In{sub 2}O{sub 3}:H films by sputtering through a mesh electrode studied by Monte Carlo simulation and thin film analysis

    Energy Technology Data Exchange (ETDEWEB)

    Scherg-Kurmes, Harald; Hafez, Ahmad; Szyszka, Bernd [Technische Universitaet Berlin, Einsteinufer 25, 10587, Berlin (Germany); Siemers, Michael; Pflug, Andreas [Fraunhofer IST, Bienroder Weg 54E, 38108, Braunschweig (Germany); Schlatmann, Rutger [Helmholtz Zentrum Berlin, PVcomB, Schwarzschildstr. 3, 12489, Berlin (Germany); Rech, Bernd [Helmholtz Zentrum Berlin, Institute for Silicon Photovoltaics, Kekulestrasse 5, 12489, Berlin (Germany)

    2016-09-15

    Hydrogen-doped indium oxide (IOH) is a transparent conductive oxide offering great potential to optoelectronic applications because of its high mobility of over 100 cm{sup 2} V{sup -1}s{sup -1}. In films deposited statically by RF magnetron sputtering, a small area directly opposing the target center with a higher resistivity and lower crystallinity than the rest of the film has been found via hall- and XRD-measurements, which we attribute to plasma damage. In order to investigate the distribution of particle energies during the sputtering process we have simulated the RF-sputtering deposition process of IOH by particle-in-cell Monte Carlo (PICMC) simulation. At the surface of ceramic sputtering targets, negatively charged oxygen ions are created. These ions are accelerated toward the substrate in the plasma sheath with energies up to 150 eV. They damage the growing film and reduce its crystallinity. The influence of a negatively biased mesh inside the sputtering chamber on particle energies and distributions has been simulated and investigated. We found that the mesh decreased the high-energetic oxygen ion density at the substrate, thus enabling a more homogeneous IOH film growth. The theoretical results have been verified by XRD X-ray diffractometry (XRD), 4-point probe, and hall measurements of statically deposited IOH films on glass. (copyright 2016 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  10. Nanostructured zinc oxide thin film for application to surface plasmon resonance based cholesterol biosensor

    Science.gov (United States)

    Kaur, Gurpreet; Tomar, Monika; Gupta, Vinay

    2015-11-01

    ZnO thin film was deposited on gold coated glass prism by RF sputtering technique in glancing angle deposition (GLAD) configuration. The structural, morphological and optical properties of the deposited film were investigated using X-ray diffraction (XRD), Atomic Force Microscopy (AFM) and Fourier Transform Infrared (FTIR) Spectroscopy. ZnO coated Au prisms (ZnO/Au/prism) were used to excite surface plasmons in Kretschmann configuration at the Au- ZnO interface on a laboratory assembled Surface Plasmon Resonance (SPR) measurement setup. Cholesterol oxidase (ChOx) enzyme was immobilized on the ZnO/Au/prism structure by physical adsorption technique. Polydimethylsiloxane (PDMS) microchannels were fabricated over ChOx/ZnO/Au/prism system and various concentrations of cholesterol were passed over the sensor surface. The concentration of cholesterol was varied from 0.12 to 10.23 mM and the SPR reflectance curves were recorded in both static as well as dynamic modes demonstrating a high sensitivity of 0.36° mM-1.

  11. Synthesis and Optical Investigations of the Guest-Host Nanostructures Alumina-SiC and Alumina-In{sub 2}O{sub 3}

    Energy Technology Data Exchange (ETDEWEB)

    Bouifoulen, A; Kassiba, A; Edely, M [Laboratoire de Physique de l' Etat Condense, UMR-CNRS 6087, Institut de recherche IRIM2F-FR-CNRS 2575-Universite du Maine, Avenue Olivier Messiaen, 72085 Le Mans Cedex 9 (France); Outzourhit, A; Oueriagli, A [Laboratoire de Physique du Solide et Couches Minces, Faculte des Sciences Semlalia, Universite Cadi Ayyad, B. P. 2390, Marrakech 40000, Maroc (Morocco); Makowska-Janusik, M [Institute of Physics, Al. Armii.Krajowej, 13/15, J. Dlugosz University, 42-200 Czestochowa (Poland); Szade, J, E-mail: kassiba@univ-lemans.fr [A.Chelkowski Institute of Physics - University Slaski in Katowice - 40-219 Katowice (Poland)

    2011-04-01

    Several strategies were developed to synthesise two classes of nanostructured thin films with nanocrystals of SiC (nc-SiC) or In{sub 2}O{sub 3} (nc-In{sub 2}O{sub 3}) confined in alumina. The syntheses were performed by using Rf-sputtering and co-pulverisation process of the suitable reactants. Thus, Al{sub 2}O{sub 3}/nc-SiC and Al{sub 2}O{sub 3}/nc-In{sub 2}O{sub 3} composite thin films were obtained and their structural and optical features analyzed respectively by XRD, XPS and UV-VIS absorption. The deposition conditions and the post-synthesis treatments were optimized in order to improve the crystalline character of confined nanocrystals. The optical properties were compared in the range 200 nm-1200 nm for bare alumina films or nanostructured ones with the semiconducting nanocrystals. The direct and indirect band band gaps were evaluated and discussed with regard to the stoechiometry and morphologies of the nanocomposite films

  12. Effect of electrode type in the resistive switching behaviour of TiO2 thin films

    International Nuclear Information System (INIS)

    Hernández-Rodríguez, E; Zapata-Torres, M; Márquez-Herrera, A; Zaleta-Alejandre, E; Meléndez-Lira, M; Cruz, W de la

    2013-01-01

    The influence of the electrode/active layer on the electric-field-induced resistance-switching phenomena of TiO 2 -based metal-oxide-metal devices (MOM) is studied. TiO 2 active layers were fabricated by the reactive rf-sputtering technique and devices were made by sandwiching between several metal electrodes. Three different MOM devices were made, according with the junction type formed between the electrode and the TiO 2 active layer, those where Ohmic-Ohmic, Ohmic-Schottky and Schottky-Schottky. The junction type was tested by electrical I-V measurements. It was found that MOM devices made with the Ohmic-Ohmic combination did not show any resistive switching behaviour in contrast with devices made with Ohmic-Schottky and Schottky-Schottky combinations. From a detailed analysis of the I-V curves it was found that transport characteristics are Ohmic for the low-resistance state for all the contacts combinations of the MOM devices, whereas in the high-resistance state it depends on contact combinations and can be identified as Ohmic, Schottky and Poole-Frenkel type. These conduction mechanisms in the low- and high-resistance states suggest that formation and rupture of conducting filaments through the film oxide is the mechanism responsible for the resistance switching.

  13. Low temperature processed InGaZnO thin film transistor using the combination of hydrogen irradiation and annealing

    Energy Technology Data Exchange (ETDEWEB)

    Park, Hyun-Woo; Choi, Min-Jun; Jo, Yongcheol; Chung, Kwun-Bum, E-mail: kbchung@dongguk.edu

    2014-12-01

    Highlights: • We studied the low temperature process of InGaZnO oxide thin film transistor. • Hydorgen irradiation was used for low temperature process below 150 °C. • Using hydrogen irradiation, field effect mobility of IGZO TFT was enhanced to ∼5 cm{sup 2} /Vs. • We examined the origin of improvement of device performance via electronic structure. - Abstract: Device performance of radio frequency (RF) sputtered InGaZnO (IGZO) thin film transistors (TFTs) were improved using combination post-treatment with hydrogen irradiation and low temperature annealing at 150 °C. Under the combination treatment, IGZO TFTs were significantly enhanced without changing physical structure and chemical composition. On the other hand, the electronic structure represents a dramatically modification of the chemical bonding states, band edge states below the conduction band, and band alignment. Compared to the hydrogen irradiation or low temperature annealing, the combination treatment induces the increase of oxygen deficient chemical bonding states, the shallow band edge state below the conduction band, and the smaller energy difference of conduction band offset, which can generate the increase in charge carrier and enhance the device performance.

  14. Improvements in the bias illumination stability of amorphous InGaZnO thin-film transistors by using thermal treatments

    International Nuclear Information System (INIS)

    Kim, Woo-Byung; Ryu, Sang Ouk; Lee, Dong-Keun

    2014-01-01

    The a-IGZO deposited by using the rf sputtering method features a conductive or an insulator characteristic based on amount of oxygen. We demonstrated that a post-treatment affects the resistance patterns of particular-sized InGaZnO(IGZO) thin films in a-IGZO thin-film transistors (TFTs). Post-annealing shifted the driving voltage of a-IGZO TFT to positive or negative values, depending on the annealing temperatures. Post-annealing may introduce oxygen vacancies or desorbed oxygen in the IGZO thin film. The changed driving voltage of IGZO TFTs coincides with the shift of the resistance pattern of IGZO. The fabricated a-IGZO TFTs exhibited a field effect mobility of 6.2 cm 2 /Vs, an excellent subthreshold gate swing of 0.32 V/decade, and a high I on/off ratio of > 10 9 . Under positive bias illumination stress (PBIS) and negative bias illumination stress (NBIS), after 3,600 seconds, the device threshold voltage shifted about 0.2 V and 0.3 V, respectively.

  15. Improvements in the bias illumination stability of amorphous InGaZnO thin-film transistors by using thermal treatments

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Woo-Byung; Ryu, Sang Ouk [Dankook University, Cheonan (Korea, Republic of); Lee, Dong-Keun [Korea Advanced Nano Fab Center, Suwon (Korea, Republic of)

    2014-07-15

    The a-IGZO deposited by using the rf sputtering method features a conductive or an insulator characteristic based on amount of oxygen. We demonstrated that a post-treatment affects the resistance patterns of particular-sized InGaZnO(IGZO) thin films in a-IGZO thin-film transistors (TFTs). Post-annealing shifted the driving voltage of a-IGZO TFT to positive or negative values, depending on the annealing temperatures. Post-annealing may introduce oxygen vacancies or desorbed oxygen in the IGZO thin film. The changed driving voltage of IGZO TFTs coincides with the shift of the resistance pattern of IGZO. The fabricated a-IGZO TFTs exhibited a field effect mobility of 6.2 cm{sup 2}/Vs, an excellent subthreshold gate swing of 0.32 V/decade, and a high I{sub on/off} ratio of > 10{sup 9}. Under positive bias illumination stress (PBIS) and negative bias illumination stress (NBIS), after 3,600 seconds, the device threshold voltage shifted about 0.2 V and 0.3 V, respectively.

  16. Studies on MgNi-Based Metal Hydride Electrode with Aqueous Electrolytes Composed of Various Hydroxides

    Directory of Open Access Journals (Sweden)

    Jean Nei

    2016-08-01

    Full Text Available Compositions of MgNi-based amorphous-monocrystalline thin films produced by radio frequency (RF sputtering with a varying composition target have been optimized. The composition Mg52Ni39Co3Mn6 is identified to possess the highest initial discharge capacity of 640 mAh·g−1 with a 50 mA·g−1 discharge current density. Reproduction in bulk form of Mg52Ni39Co3Mn6 alloy composition was prepared through a combination of melt spinning (MS and mechanical alloying (MA, shows a sponge-like microstructure with >95% amorphous content, and is chosen as the metal hydride (MH alloy for a sequence of electrolyte experiments with various hydroxides including LiOH, NaOH, KOH, RbOH, CsOH, and (C2H54N(OH. The electrolyte conductivity is found to be closely related to cation size in the hydroxide compound used as 1 M additive to the 4 M KOH aqueous solution. The degradation performance of Mg52Ni39Co3Mn6 alloy through cycling demonstrates a strong correlation with the redox potential of the cation in the alkali hydroxide compound used as 1 M additive to the 5 M KOH aqueous solution. NaOH, CsOH, and (C2H54N(OH additions are found to achieve a good balance between corrosion and conductivity performances.

  17. (001) 3C SiC/Ni contact interface: In situ XPS observation of annealing induced Ni2Si formation and the resulting barrier height changes

    Science.gov (United States)

    Tengeler, Sven; Kaiser, Bernhard; Chaussende, Didier; Jaegermann, Wolfram

    2017-04-01

    The electronic states of the (001) 3C SiC/Ni interface prior and post annealing are investigated via an in situ XPS interface experiment, allowing direct observation of the induced band bending and the transformation from Schottky to ohmic behaviour for the first time. A single domain (001) 3C SiC sample was prepared via wet chemical etching. Nickel was deposited on the sample in multiple in situ deposition steps via RF sputtering, allowing observation of the 3C SiC/Ni interface formation. Over the course of the experiments, an upward band bending of 0.35 eV was observed, along with defect induced Fermi level pinning. This indicates a Schottky type contact behaviour with a barrier height of 0.41 eV. The subsequent annealing at 850 °C for 5 min resulted in the formation of a Ni2Si layer and a reversal of the band bending to 0.06 eV downward. Thus explaining the ohmic contact behaviour frequently reported for annealed n-type 3C SiC/Ni contacts.

  18. Cu mesh for flexible transparent conductive electrodes.

    Science.gov (United States)

    Kim, Won-Kyung; Lee, Seunghun; Hee Lee, Duck; Hee Park, In; Seong Bae, Jong; Woo Lee, Tae; Kim, Ji-Young; Hun Park, Ji; Chan Cho, Yong; Ryong Cho, Chae; Jeong, Se-Young

    2015-06-03

    Copper electrodes with a micromesh/nanomesh structure were fabricated on a polyimide substrate using UV lithography and wet etching to produce flexible transparent conducting electrodes (TCEs). Well-defined mesh electrodes were realized through the use of high-quality Cu thin films. The films were fabricated using radio-frequency (RF) sputtering with a single-crystal Cu target--a simple but innovative approach that overcame the low oxidation resistance of ordinary Cu. Hybrid Cu mesh electrodes were fabricated by adding a capping layer of either ZnO or Al-doped ZnO. The sheet resistance and the transmittance of the electrode with an Al-doped ZnO capping layer were 6.197 ohm/sq and 90.657%, respectively, and the figure of merit was 60.502 × 10(-3)/ohm, which remained relatively unchanged after thermal annealing at 200 °C and 1,000 cycles of bending. This fabrication technique enables the mass production of large-area flexible TCEs, and the stability and high performance of Cu mesh hybrid electrodes in harsh environments suggests they have strong potential for application in smart displays and solar cells.

  19. Stoichiometry and phase purity control of radio frequency magnetron sputter deposited Ba0.45Sr0.55TiO3 thin films for tunable devices

    Science.gov (United States)

    Alema, Fikadu; Reinholz, Aaron; Pokhodnya, Konstantin

    2013-11-01

    The systematic study of the oxygen partial pressure (OPP) and total chamber gas pressure (TGP) effects on the stoichiometry and crystal structure of rf sputtered Ba0.45Sr0.55TiO3 (BST) films and their phase purity allowed identifying close to optimal sputtering parameters for BST single phase polycrystalline film. The film with a Ba/Sr ratio equal to that of the source target and (Ba + Sr)/Ti ratio close to unity demonstrated the enhanced permittivity value of 553 and tunability of 69%. It was confirmed that the increase of TGP enables better match of the film and target stoichiometry. However, using O2/Ar ratio as a parameter should be utilized cautiously since exceeding a threshold OPP (2 mTorr in our case) may facilitate secondary phase formation. Relatively large dielectric losses were observed in both films sputtered at high (30 mTorr) and low (5 mTor) TGPs. The presence of oxygen vacancies was identified as a probable cause of losses, which is indirectly confirmed by the deviation of the film lattice constant from that of the bulk target.

  20. Epitaxial growth of rhenium with sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Oh, Seongshik [National Institute of Standards and Technology, Boulder, CO 80305 (United States) and Department of Physics, University of Illinois, Urbana, IL 61801 (United States)]. E-mail: soh@boulder.nist.gov; Hite, Dustin A. [National Institute of Standards and Technology, Boulder, CO 80305 (United States); Cicak, K. [National Institute of Standards and Technology, Boulder, CO 80305 (United States); Osborn, Kevin D. [National Institute of Standards and Technology, Boulder, CO 80305 (United States); Simmonds, Raymond W. [National Institute of Standards and Technology, Boulder, CO 80305 (United States); McDermott, Robert [University of California, Santa Barbara, CA 93106 (United States); Cooper, Ken B. [University of California, Santa Barbara, CA 93106 (United States); Steffen, Matthias [University of California, Santa Barbara, CA 93106 (United States); Martinis, John M. [University of California, Santa Barbara, CA 93106 (United States); Pappas, David P. [National Institute of Standards and Technology, Boulder, CO 80305 (United States)

    2006-02-21

    We have grown epitaxial Rhenium (Re) (0001) films on {alpha}-Al{sub 2}O{sub 3} (0001) substrates using sputter deposition in an ultra high vacuum system. We find that better epitaxy is achieved with DC rather than with RF sputtering. With DC sputtering, epitaxy is obtained with the substrate temperatures above 700 deg. C and deposition rates below 0.1 nm/s. The epitaxial Re films are typically composed of terraced hexagonal islands with screw dislocations, and island size gets larger with high temperature post-deposition annealing. The growth starts in a three dimensional mode but transforms into two dimensional mode as the film gets thicker. With a thin ({approx}2 nm) seed layer deposited at room temperature and annealed at a high temperature, the initial three dimensional growth can be suppressed. This results in larger islands when a thick film is grown at 850 deg. C on the seed layer. We also find that when a room temperature deposited Re film is annealed to higher temperatures, epitaxial features start to show up above {approx}600 deg. C, but the film tends to be disordered.

  1. Graphene synthesis from graphite/Ni composite films grown by sputtering

    International Nuclear Information System (INIS)

    Shin, Dong Hee; Yang, Seung Bum; Shin, Dong Yeol; Kim, Chang Oh; Kim, Sung; Choi, Suk Ho; Paek, Sang Hyon

    2012-01-01

    Graphite/Ni composite films have been deposited on SiO 2 /Si (100) wafers by varying their graphite concentration (n G ) and thickness (t) from 2 to 12 wt% and 40 to 400 nm, respectively, in a RF sputtering system, subsequently annealed at 900 .deg. C for 4 min, and then slowly cooled to room temperature to form graphene layers on Ni surfaces. Several structural-analysis techniques reveal the optimum nG (∼8 wt%) and t (∼160 nm) of the composite films for the synthesis of fewest-layer, defect-minimized graphene. At the annealing temperature, carbon atoms diffuse out from the composite film, followed by their precipitation as graphene on the Ni layer as the carbon solubility limit in Ni is reached during the cooling period. Based on this mechanism, the optimum conditions are explained. Our approach provides an advantage in that the number of layers can be simply tuned by varying n G and t of the composite films.

  2. Fabrication of high-quality single-crystal Cu thin films using radio-frequency sputtering.

    Science.gov (United States)

    Lee, Seunghun; Kim, Ji Young; Lee, Tae-Woo; Kim, Won-Kyung; Kim, Bum-Su; Park, Ji Hun; Bae, Jong-Seong; Cho, Yong Chan; Kim, Jungdae; Oh, Min-Wook; Hwang, Cheol Seong; Jeong, Se-Young

    2014-08-29

    Copper (Cu) thin films have been widely used as electrodes and interconnection wires in integrated electronic circuits, and more recently as substrates for the synthesis of graphene. However, the ultra-high vacuum processes required for high-quality Cu film fabrication, such as molecular beam epitaxy (MBE), restricts mass production with low cost. In this work, we demonstrated high-quality Cu thin films using a single-crystal Cu target and radio-frequency (RF) sputtering technique; the resulting film quality was comparable to that produced using MBE, even under unfavorable conditions for pure Cu film growth. The Cu thin film was epitaxially grown on an Al2O3 (sapphire) (0001) substrate, and had high crystalline orientation along the (111) direction. Despite the 10(-3) Pa vacuum conditions, the resulting thin film was oxygen free due to the high chemical stability of the sputtered specimen from a single-crystal target; moreover, the deposited film had >5× higher adhesion force than that produced using a polycrystalline target. This fabrication method enabled Cu films to be obtained using a simple, manufacturing-friendly process on a large-area substrate, making our findings relevant for industrial applications.

  3. Sputtered PdO Decorated TiO2 Sensing Layer for a Hydrogen Gas Sensor

    Directory of Open Access Journals (Sweden)

    Jeong Hoon Lee

    2018-01-01

    Full Text Available We report a sputtered PdO decorated TiO2 sensing layer by radiofrequency (RF sputtering methods and demonstrated gas sensing performance for H2 gas. We prepared sputtered anatase TiO2 sensing films with 200 nm thickness and deposited a Pd layer on top of the TiO2 films with a thickness ranging from 3 nm to 13 nm. Using an in situ TiO2/Pd multilayer annealing process at 550°C for 1 hour, we observed that Pd turns into PdO by Auger electron spectroscopy (AES depth profile and confirmed decorated PdO on TiO2 sensing layer from scanning electron microscope (SEM and atomic-force microscope (AFM. We also observed a positive sensing signal for 3, 4.5, and 6.5 nm PdO decorated TiO2 sensor while we observed negative output signal for a 13.5 nm PdO decorated one. Using a microheater platform, we acquired fast response time as ~11 sec and sensitivity as 6 μV/ppm for 3 nm PdO under 33 mW power.

  4. Origin of room temperature ferromagnetic moment in Rh-rich [Rh/Fe] multilayer thin films

    International Nuclear Information System (INIS)

    Kande, Dhishan; Laughlin, David; Zhu Jiangang

    2010-01-01

    B2 ordered FeRh thin films switch from antiferromagnetic (AFM) to ferromagnetic (FM) state on heating above 350 K and switch back on cooling, with a hysteresis. This property makes FeRh a very attractive choice as a write-assist layer material for low temperature heat assisted magnetic recording (HAMR) media. Studies have shown that as we decrease the thickness of the FeRh films, the B2 phase is no longer AFM even below 350 K and there is a thickness dependant FM stabilization of the B2 phase. It was also proved that slightly Rh-richer compositions (>50 at. % Rh) were more preferable to stabilize the AFM phase. The current study focuses on growing highly ordered FeRh films by alternate layer rf sputtering of thin layers of iron and rhodium onto a heated substrate. It has been shown that films with rhodium content beyond 55 at. % contain a disordered bcc FM phase which gives rise to residual moment at room temperature even for thicker films.

  5. Deposition of stress free c-axis oriented LiNbO{sub 3} thin film grown on (002) ZnO coated Si substrate

    Energy Technology Data Exchange (ETDEWEB)

    Shandilya, Swati; Gupta, Vinay [Department of Physics and Astrophysics, University of Delhi, Delhi 110007 (India); Tomar, Monika [Miranda House, University of Delhi, Delhi 110007 (India)

    2012-05-15

    C-axis oriented lithium niobate thin films have been deposited on Si substrate using RF sputtering technique. A thin buffer layer of c-axis (002) oriented ZnO on Si substrate has been used as a nucleating layer to promote the growth of (006) oriented LiNbO{sub 3} film. The processing gas composition and pressure are found to be very critical in obtaining stress free LiNbO{sub 3} film having desired (006) orientation. The LiNbO{sub 3} films deposited under unique combination of sputtering pressure (10 mTorr) and argon percentage (80%) in reactive gas (Ar + O{sub 2}) composition become almost stress free having lattice parameter (1.3867 A) close to the bulk value. The observed variation in the structural properties and optical phonon modes observed by Raman spectroscopic studies of the oriented LiNbO{sub 3} thin film with stress has been correlated with growth kinetics.

  6. Contribution of Rutherford backscattering spectrometry to the study of irradiation effects on diffusion properties in oxides glasses

    International Nuclear Information System (INIS)

    Calmon, P.

    1990-10-01

    We have studied the impurity diffusion of heavy elements (lead, uranium) in soda lime silicate glasses under irradiation with ions (He + 1000 KeV,Ar + 250-500 KeV), with gamma rays (1.17-1.33 MeV) and with X-rays (40-60 KeV). RF sputtering and ionic implantation methods have been used for the diffusion target preparation. A comparison of these technics reveals ionic implantation as the most suitable method. For the analysis of profiles the backscattering spectrometry has been used. RBS simulation programs have been developed in order to treat some complex situations like lateral inhomogeneities and composition changes of the sample. Enhanced diffusion and occasionally precipitation have been observed under ions irradiation for lead, while uranium was more diffusing under gamma rays irradiations. On the contrary no X-rays effect have been noted. Our results show that network modifiers impurities diffusion (in our case lead) are generally controlled by sodium redistributions. The radiation damages are not negligible and electronic excitations play a dominant role [fr

  7. MOS structures containing silicon nanoparticles for memory device applications

    International Nuclear Information System (INIS)

    Nedev, N; Zlatev, R; Nesheva, D; Manolov, E; Levi, Z; Brueggemann, R; Meier, S

    2008-01-01

    Metal-oxide-silicon structures containing layers with amorphous or crystalline silicon nanoparticles in a silicon oxide matrix are fabricated by sequential physical vapour deposition of SiO x (x = 1.15) and RF sputtering of SiO 2 on n-type crystalline silicon, followed by high temperature annealing in an inert gas ambient. Depending on the annealing temperature, 700 deg. C or 1000 deg. C, amorphous or crystalline silicon nanoparticles are formed in the silicon oxide matrix. The annealing process is used not only for growing nanoparticles but also to form a dielectric layer with tunnelling thickness at the silicon/insulator interface. High frequency C-V measurements demonstrate that both types of structures can be charged negatively or positively by applying a positive or negative voltage on the gate. The structures with amorphous silicon nanoparticles show several important advantages compared to the nanocrystal ones, such as lower defect density at the interface between the crystalline silicon wafer and the tunnel silicon oxide, better retention characteristics and better reliability

  8. Design and characteristics of L-C thin films filter at microwave frequency band

    Science.gov (United States)

    Kim, In-Sung; Min, Bok-Ki; Song, Jae-Sung

    2005-12-01

    Multifunction corresponding to multimedia age has furthermore required high integration to the devices at microwave band, so more evolution for multi-layer integration like system on chip(SoC) becomes to be necessary. In wireless mobile communication, portable mobile phones grew up to a huge market. Microwave devices have played an important role in the wireless communication systems. One challenge in the implementation of circuit integration is in the design of micro wave band pass filter with thin film MOM capacitor and spiral inductor. In this paper, Cu and TaO thin film with RF sputtering was deposited for inductor and capacitor on the SiO II/Si(100) substrate. MIM capacitor and spiral inductor was fabricated for L-C band pass filter by sputtering and lift-off. We are analyzed and designed thin films L-C passive components for band pass filter at 900 MHz and 1.8 GHz, an important devices for mobile communication. Based on the high-Q values of passive components, MIM capacitor and spiral inductors for L-C band pass filter, a low insertion loss of L-C passive components can be realized with a minimized chip area. The insertion loss was 3 dB for a 1.8 GHz filter, and was 5 dB for a 900 MHz filter. This paper also discusses a theoretical analysis and practical design to L-C band pass filter.

  9. AZO/Au/AZO tri-layer thin films for the very low resistivity transparent electrode applications

    Energy Technology Data Exchange (ETDEWEB)

    Chu, Chien-Hsun [Department of Materials Science and Engineering, National Cheng Kung University, Tainan 70101, Taiwan (China); Wu, Hung-Wei, E-mail: hwwu@mail.ksu.edu.tw [Department of Computer and Communication, Kun Shan University, Tainan 71003, Taiwan (China); Huang, Jow-Lay [Department of Materials Science and Engineering, National Cheng Kung University, Tainan 70101, Taiwan (China); Department of Chemical and Materials Engineering, National University of Kaohsiung, Kaohsiung 81148, Taiwan (China); Research Center for Energy Technology and Strategy, National Cheng Kung University, Tainan 70101, Taiwan (China)

    2014-08-01

    Highlights: • High-quality Al-doped ZnO (AZO)/Au/AZO transparent conducting oxide films. • AZO films (30 nm) made by RF sputtering; ion sputtering for Au film (5–20 nm). • Effects of Au thickness on optical and electrical properties were analyzed. • The resistivity of 9 × 10{sup −5} Ω cm and the transmittance of 86.2% of the multilayer films were obtained in this study. - Abstract: Aluminum-doped ZnO (AZO)/gold/AZO tri-layer structures with very low resistivity and high transmittance are prepared by simultaneous RF magnetron sputtering (for AZO) and ion sputtering (for Au). The properties of the tri-layer films are investigated at different Au layer thicknesses (5–20 nm). The effects of Au layer thickness and the role of Au on the transmission properties of the tri-layer films were investigated. The very low resistivity of 1.01 × 10{sup −5} Ω cm, mobility of 27.665 cm{sup 2} V{sup −1} s{sup −1}, and carrier concentration of 4.563 × 10{sup 22} cm{sup −3} were obtained at an Au layer thickness of 20 nm. The peak transmittance of 86.18% at 650-nm wavelength was obtained at an Au layer thickness of 8 nm. These results show the films to be a good candidate for high-quality electrode scheme in various display applications.

  10. Improvement of dielectric properties of BLT thin films deposited by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Besland, M P; Barroy, P R J; Richard-Plouet, M; Tessier, P Y; Brohan, L; Djouadi, M A [Universite de Nantes - Institut des Materiaux Jean Rouxel, UMR CNRS 6502, 2, rue de la Houssiniere BP32229, 44322 Nantes Cedex (France); Borderon, C; Tacon, S Le; Averty, D; Gundel, H W [Institut de Recherche en Electrotechnique et Electronique de Nantes Atlantique, UPRES-EA 1770, IREENA, Universite de Nantes, 2, rue de la Houssiniere, BP 92208, 44322 Nantes Cedex (France)], E-mail: Marie-Paule.Besland@cnrs-imn.fr

    2008-01-15

    Well crystallized BLT thin films were deposited by RF magnetron sputtering using a target of Aurivillius phase Bi{sub 3.25}La{sub 0.75}Ti{sub 3}O{sub 12}(BLT{sub 0,75}), elaborated in our institute. RF sputtering experiments were performed at room temperature with an argon/oxygen mixture, in a pressure range of 20-50 mTorr. Optimisation of the plasma parameters, namely deposition pressure, RF power and oxygen content in the gas phase, allows obtaining BLT films with a chemical composition close to Bi{sub 3.25}La{sub 0.75}Ti{sub 3}O{sub 12}. After ex-situ annealing under oxygen atmosphere at 650 deg. C, BLT films deposited on Pt/TiO{sub 2}/SiO{sub 2}/Si (multilayer) substrates exhibit well defined rod-like grains morphology. A two step deposition process appeared to be necessary in order to reach satisfying dielectric properties. The effect of the plasma parameters on the chemical composition and electrical properties are presented and discussed.

  11. Improvement of dielectric properties of BLT thin films deposited by magnetron sputtering

    International Nuclear Information System (INIS)

    Besland, M P; Barroy, P R J; Richard-Plouet, M; Tessier, P Y; Brohan, L; Djouadi, M A; Borderon, C; Tacon, S Le; Averty, D; Gundel, H W

    2008-01-01

    Well crystallized BLT thin films were deposited by RF magnetron sputtering using a target of Aurivillius phase Bi 3.25 La 0.75 Ti 3 O 12 (BLT 0,75 ), elaborated in our institute. RF sputtering experiments were performed at room temperature with an argon/oxygen mixture, in a pressure range of 20-50 mTorr. Optimisation of the plasma parameters, namely deposition pressure, RF power and oxygen content in the gas phase, allows obtaining BLT films with a chemical composition close to Bi 3.25 La 0.75 Ti 3 O 12 . After ex-situ annealing under oxygen atmosphere at 650 deg. C, BLT films deposited on Pt/TiO 2 /SiO 2 /Si (multilayer) substrates exhibit well defined rod-like grains morphology. A two step deposition process appeared to be necessary in order to reach satisfying dielectric properties. The effect of the plasma parameters on the chemical composition and electrical properties are presented and discussed

  12. Effect of RF power and substrate temperature on physical properties of Zr0.8Sn0.2TiO4 films by RF magnetron sputtering

    International Nuclear Information System (INIS)

    Hsu Cheng-Shing; Huang Cheng-Liang

    2001-01-01

    Physical properties of rf-sputtered crystalline (Zr 0.8 Sn 0.2 )TiO 4 (ZST) thin films deposited on n-type Si(100) substrates at different rf powers and substrate temperatures have been investigated. The structural and morphological characteristics analyzed by X-ray diffraction (XRD) and scanning electron microscopy (SEM) were found to be sensitive to deposition conditions, such as rf power from 300 W to 400 W and substrate temperature (400degC, 450degC). Highly oriented ZST (111) and (002) perpendicular to the substrate surface were identified at a rf power of 400 W and a substrate temperature of 450degC. The selected-area diffraction pattern showed that the deposited films exhibited a polycrystalline microstructure. The grain size as well as the deposition rate of the film increased with the increase in both the rf power and the substrate temperature. The leakage current decreased with increasing rf power and substrate temperature. As rf power = 400 W and substrate temperature = 450degC, a leakage current of 7.2x10 -11 A was obtained at 1 V. (author)

  13. Effects of the position substrate upon the structural behaviour, electrical and optical properties of zinc-oxide films used in solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Bouderbala, M.; Hamzaoui, S.; Stambouli, A.B.; Bouziane, H. [USTO, Lab. de Microscopie Electronique, Oran (Algeria)

    1999-12-01

    The preparation by the rf sputtering technique and characterisation of ZnO thin films used as windows in solar cells are described. The electrical behaviour and structural spectra clearly show an important effect of the substrate position with respect to the target. In fact, among all the studied substrate positions, only the samples facing the target are randomly oriented having the mixed orientation (100), (002) and (101). All the others have the c(002)-axis orientation. The scanning electron-microscope observations confirm the X-ray analysis results. The last samples have a resistivity as low as 10{sup -3} {omega}cm while the randomly-oriented, ones have a large resistivity of about 10{sup 2}-10{sup 3} {omega}cm. These latter show, in their transmittance characteristics, a slight shift towards higher wavelengths. However, no effect is noticed when the other samples are optically assessed. Consequently, the optical gap is found to be about 3.38 eV for the conducting films and 3.3 eV for the ones having a higher resistivity. The average transmittance in the visible range is around 85-90% for all the samples. (Author)

  14. Magnetotransport properties of c-axis oriented La0.7Sr0.3MnO3 thin films on MgO-buffered SiO2/Si substrates

    International Nuclear Information System (INIS)

    Kang, Young-Min; Ulyanov, Alexander N.; Shin, Geo-Myung; Lee, Sung-Yun; Yoo, Dae-Gil; Yoo, Sang-Im

    2009-01-01

    c-axis oriented La 0.7 Sr 0.3 MnO 3 (LSMO) films on MgO-buffered SiO 2 /Si substrates were prepared, and their texture, microstructure, and magnetotransport properties were studied and compared to epitaxial LSMO/MgO (001) and polycrystalline LSMO/SiO 2 /Si films. c-axis oriented MgO buffer layers were obtained on amorphous SiO 2 layer through rf sputter deposition at low substrate temperature and consequent postannealing processes. In situ pulsed laser deposition-grown LSMO films, deposited on the MgO layer, show strong c-axis texture, but no in-plane texture. The c-axis oriented LSMO films which are magnetically softer than LSMO/SiO 2 /Si films exhibit relatively large low field magnetoresistance (LFMR) and sharper MR drop at lower field. The large LFMR is attributed to a spin-dependent scattering of transport current at the grain boundaries

  15. Ferroelectric properties of BaTiO3/PbZr0.2Ti.08O3 bilayer thin film

    Science.gov (United States)

    Salev, Pavel; Yang, Chun; Grigoriev, Alexei

    2014-03-01

    The thin film ferroelectric BaTiO3/PbZr0.2Ti0.8O3 bilayer was epitaxially grown on SrRuO3/SrTiO3 substrate by RF sputtering. Electrical measurements of polarization switching revealed two different switching regimes - a small ferroelectric hysteresis loop at low applied voltage and a larger loop at a high voltage. The measured dielectric permittivity corresponds to weak electrostatic coupling between two layers according to Landau-Ginsburg-Devonshire theory. This weak coupling may allow for independent polarization states to exist in individual layers. This can lead to stable head-to-head and tail-to-tail polarization domain configurations, which would explain the two switching regimes observed in electrical measurements. The compensation of polarization gradient across the interface can be explained by the enhancement of interface charge carrier density due to strong bending of electron energy bands. This work was supported by NSF award DMR-1057159.

  16. Effect of deposition time of sputtering Ag-Cu thin film on mechanical and antimicrobial properties

    Science.gov (United States)

    Purniawan, A.; Hermastuti, R.; Purwaningsih, H.; Atmono, T. M.

    2018-04-01

    Metallic implants are important components in biomedical treatment. However, post-surgery infection often occurs after installation of implant. The infections are usually treated by antibiotics, but it still causes several secondary problems. As a prevention treatment, the surgical instruments and implants must be in a sterile condition. This action is still not optimal too because the material still can attract the bacteria. From material science point of view, it can be anticipated by developing a type of material which has antibacterial properties or called antimicrobial material. Silver (Ag) and Copper (Cu) have antimicrobial properties to prevent the infection. In this research, the influence of deposition time of Ag-Cu thin film deposition process as antimicrobial material with Physical Vapor Deposition (PVD) RF Sputtering method was analyzed. Deposition time used were for 10, 15 and 20 minutes in Argon gas pressure around 3 x 10-2 mbar in during deposition process. The morphology and surface roughness of Ag-Cu thin film were characterized using SEM and AFM. Based on the results, the deposition time influences the quality morphology that the thin films have good homogeneity and complete structure for longer deposition time. In addition, from roughness measurement results show that increase deposition time decrease the roughness of thin film. Antimicrobial performance was analyzed using Kirby Bauer Test. The results show that all of sample have good antimicrobial inhibition. Adhesion quality was evaluated using Rockwell C Indentation Test. However, the results indicate that the Ag-Cu thin film has low adhesion strength.

  17. Nano-hardness estimation by means of Ar+ ion etching

    International Nuclear Information System (INIS)

    Bartali, R.; Micheli, V.; Gottardi, G.; Vaccari, A.; Safeen, M.K.; Laidani, N.

    2015-01-01

    When the coatings are in nano-scale, the mechanical properties cannot be easily estimated by means of the conventional methods due to: tip shape, instrument resolution, roughness, and substrate effect. In this paper, we proposed a semi-empirical method to evaluate the mechanical properties of thin films based on the sputtering rate induced by bombardment of Ar + ion. The Ar + ion bombardment was induced by ion gun implemented in Auger electron spectroscopy (AES). This procedure has been applied on a series of coatings with different structure (carbon films) and a series of coating with a different density (ZnO thin films). The coatings were deposited on Silicon substrates by RF sputtering plasma. The results show that, as predicted by Insepov et al., there is a correlation between hardness and sputtering rate. Using reference materials and a simple power law equation the estimation of the nano-hardness using an Ar + beam is possible. - Highlights: • ZnO film and Carbon films were grown on silicon using PVD. • The growth temperature was room temperature. • The hardness of the coatings was estimated by means of nanoindentation. • Evaluation of resistance of materials to the mechanical damage induced by an Ar + ion gun (AES). • The hardness have been studied and a power law with the erosion rate has been found

  18. Crystallization of silicon films of submicron thickness by blue-multi-laser-diode annealing

    Energy Technology Data Exchange (ETDEWEB)

    Mugiraneza, Jean de Dieu; Shirai, Katsuya; Suzuki, Toshiharu; Okada, Tatsuya; Noguchi, Takashi [University of the Ryukyus, Okinawa (Japan); Matsushima, Hideki; Hashimoto, Takao; Ogino, Yoshiaki; Sahota, Eiji [Hitachi Computer Peripherals Co. Ltd, Kanagawa (Japan)

    2012-01-15

    Blue-Multi-Laser-Diode Annealing (BLDA) was performed in the continuous wave (CW) mode on Si films as thick as 0.5 {mu}m and 1 {mu}m deposited by rf sputtering. As a result of controlling the laser power from 4.0 to 4.8 W, a whole Si layer of 0.5 {mu}m in thickness was completely crystallized and consisted of a columnar structure of fine grains beneath a partially melted Si surface owing to the high temperature gradient along the depth in the Si layer. After additional hydrogenation in a furnace ambient, the ratio of the photo/dark current under AM 1.5 illumination distinctly improved to 6 times higher than that of as-deposited condition. The BLDA is expected to be applied to thin-film solar cells and/or to thin film transistor (TFT) photo-sensor systems on panels as a new low-temperature poly-silicon (LTPS) fabrication technique.

  19. In2Ga2ZnO7 oxide semiconductor based charge trap device for NAND flash memory

    Science.gov (United States)

    Hwang, Eun Suk; Kim, Jun Shik; Jeon, Seok Min; Lee, Seung Jun; Jang, Younjin; Cho, Deok-Yong; Hwang, Cheol Seong

    2018-04-01

    The programming characteristics of charge trap flash memory device adopting amorphous In2Ga2ZnO7 (a-IGZO) oxide semiconductors as channel layer were evaluated. Metal-organic chemical vapor deposition (MOCVD) and RF-sputtering processes were used to grow a 45 nm thick a-IGZO layer on a 20 nm thick SiO2 (blocking oxide)/p++-Si (control gate) substrate, where 3 nm thick atomic layer deposited Al2O3 (tunneling oxide) and 5 nm thick low-pressure CVD Si3N4 (charge trap) layers were intervened between the a-IGZO and substrate. Despite the identical stoichiometry and other physicochemical properties of the MOCVD and sputtered a-IGZO, a much faster programming speed of MOCVD a-IGZO was observed. A comparable amount of oxygen vacancies was found in both MOCVD and sputtered a-IGZO, confirmed by x-ray photoelectron spectroscopy and bias-illumination-instability test measurements. Ultraviolet photoelectron spectroscopy analysis revealed a higher Fermi level (E F) of the MOCVD a-IGZO (∼0.3 eV) film than that of the sputtered a-IGZO, which could be ascribed to the higher hydrogen concentration in the MOCVD a-IGZO film. Since the programming in a flash memory device is governed by the tunneling of electrons from the channel to charge trapping layer, the faster programming performance could be the result of a higher E F of MOCVD a-IGZO.

  20. Laser irradiation and thermal treatment inducing selective crystallization in Sb2O3-Sb2S3 glassy films

    Science.gov (United States)

    Avila, L. F.; Pradel, A.; Ribeiro, S. J. L.; Messaddeq, Y.; Nalin, M.

    2015-02-01

    The influence of both thermal treatment and laser irradiation on the structural and optical properties of films in the Sb2O3-Sb2S3 system was investigated. The films were prepared by RF-sputtering using glass compositions as raw materials. Irreversible photodarkening effect was observed after exposure the films to a 458 nm solid state laser. It is shown, for the first time, the use of holographic technique to measure "in situ", simultaneously and independently, the phase and amplitude modulations in glassy films. The films were also photo-crystallized and analysed "in situ" using a laser coupled to a micro-Raman equipment. Results showed that Sb2S3 crystalline phase was obtained after irradiation. The effect of thermal annealing on the structure of the films was carried out. Different from the result obtained by irradiation, thermal annealing induces the crystallization of the Sb2O3 phase. Photo and thermal induced effects on films were studied using UV-Vis and Raman spectroscopy, atomic force microscopy (AFM), thermal analysis (DSC), X-ray diffraction, scanning electron microscopy (MEV) and energy-dispersive X-ray spectroscopy (EDX).

  1. The influence of annealing in nitrogen atmosphere on the electrical, optical and structural properties of spray- deposited ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Ikhmayies, S.J. [Applied Science Private Univ., Amman (Jordan). Dept. of Physics; Abu El-Haija, N.M.; Ahmad-Bitar, R.N. [Jordan Univ., Amman (Jordan). Dept. of Physics

    2009-07-01

    Thin-film zinc oxide (ZnO) has many applications in solar cell technology and is considered to be a candidate for the substitution of indium tin oxide and tin oxide. ZnO thin films can be prepared by thermal evaporation, rf-sputtering, atomic layer deposition, chemical vapor deposition, sol-gel, laser ablation and spray pyrolysis technique. Spray pyrolysis has received much attention because of its simplicity and low cost. In this study, large area and highly uniform polycrystalline ZnO thin films were produced by spray pyrolysis using a home-made spraying system on glass substrates at 450 degrees C. The electrical, optical and structural properties of the ZnO films were enhanced by annealing the thin films in nitrogen atmosphere. X-ray diffraction revealed that the films are polycrystalline with a hexagonal wurtzite structure. The preferential orientation did not change with annealing, but XRD patterns revealed that some very weak lines had grown. There was no noticeable increase in the grain size. The transmittance of the films increased as a result of annealing. It was concluded that post-deposition annealing is essential to improve the quality of the ZnO thin films. The electrical properties improved due to a decrease in resistivity. 13 refs., 5 figs.

  2. Nanostructured titanium/diamond-like carbon multilayer films: deposition, characterization, and applications.

    Science.gov (United States)

    Dwivedi, Neeraj; Kumar, Sushil; Malik, Hitendra K

    2011-11-01

    Titanium/diamond-like carbon multilayer (TDML) films were deposited using a hybrid system combining radio frequency (RF)-sputtering and RF-plasma enhanced chemical vapor deposition (PECVD) techniques under a varied number of Ti/diamond-like carbon (DLC) bilayers from 1 to 4, at high base pressure of 1 × 10(-3) Torr. The multilayer approach was used to create unique structures such as nanospheres and nanorods in TDML films, which is confirmed by scanning electron microscopy (SEM) analysis and explained by a hypothetical model. Surface composition was evaluated by X-ray photoelectron spectroscopy (XPS), whereas energy dispersive X-ray analysis (EDAX) and time-of-flight secondary ion mass spectrometer (ToF-SIMS) measurements were performed to investigate the bulk composition. X-ray diffraction (XRD) was used to evaluate the phase and crystallinity of the deposited TDML films. Residual stress in these films was found to be significantly low. These TDML films were found to have excellent nanomechanical properties with maximum hardness of 41.2 GPa. In addition, various nanomechanical parameters were calculated and correlated with each other. Owing to metallic interfacial layer of Ti in multilayer films, the optical properties, electrical properties, and photoluminescence were improved significantly. Due to versatile nanomechanical properties and biocompatibility of DLC and DLC based films, these TDML films may also find applications in biomedical science.

  3. Photoluminescence of Er-doped Si-SiO2 and Al-Si-SiO2 sputtered thin films

    International Nuclear Information System (INIS)

    Rozo, C.; Fonseca, L.F.; Jaque, D.; Sole, J.Garcia

    2008-01-01

    Er-doped Si-SiO 2 and Al-Si-SiO 2 films have been deposited by rf-sputtering being annealed afterwards. Annealing behavior of the Er 3+ : 4 I 13/2 → 4 I 15/2 emission of Er-doped Si-SiO 2 yields a maximum intensity for annealing at 700-800 deg. C. 4 I 13/2 → 4 I 15/2 peak emission for Er-doped Al-Si-SiO 2 at 1525 nm is shifted from that for Er-doped Si-SiO 2 at 1530 nm and the bandwidth increases from 29 to 42 nm. 4 I 13/2 → 4 I 15/2 emission decays present a fast decaying component related to Er ions coupled to Si nanoparticles, defects, or other ions, and a slow decaying component related to isolated Er ions. Excitation wavelength dependence and excitation power dependence for the 4 I 13/2 → 4 I 15/2 emission correspond with energy transfer from Si nanoparticles. Populating of the 4 I 11/2 level in Er-doped Si-SiO 2 involves branching and energy transfer upconversion involving two or more Er ions. Addition of Al reduces the populating of this level to an energy transfer upconversion involving two ions

  4. Study of Sn and Mg doping effects on TiO2/Ge stack structure by combinatorial synthesis

    Science.gov (United States)

    Nagata, Takahiro; Suzuki, Yoshihisa; Yamashita, Yoshiyuki; Ogura, Atsushi; Chikyow, Toyohiro

    2018-04-01

    The effects of Sn and Mg doping of a TiO2 film on a Ge substrate were investigated to improve leakage current properties and Ge diffusion into the TiO2 film. For systematic analysis, dopant-composition-spread TiO2 samples with dopant concentrations of up to 20.0 at. % were fabricated by RF sputtering and a combinatorial method. X-ray photoelectron spectroscopy revealed that the instability of Mg doping of TiO2 at dopant concentrations above 10.5 at. %. Both Sn and Mg dopants reduced Ge diffusion into TiO2. Sn doping enhanced the crystallization of the rutile phase, which is a high-dielectric-constant phase, although the Mg-doped TiO2 film indicated an amorphous structure. Sn-doping indicated systematic leakage current reduction with increasing dopant concentration. Doping at Sn concentrations higher than 16.8 at. % improved the leakage properties (˜10-7 A/cm2 at -3.0 V) and capacitance-voltage properties of metal-insulator-semiconductor (MIS) operation. The Sn doping of TiO2 may be useful for interface control and as a dielectric material for Ge-based MIS capacitors.

  5. Piezoelectric Zinc Oxide Based MEMS Acoustic Sensor

    Directory of Open Access Journals (Sweden)

    Aarti Arora

    2008-04-01

    Full Text Available An acoustic sensors exhibiting good sensitivity was fabricated using MEMS technology having piezoelectric zinc oxide as a dielectric between two plates of capacitor. Thin film zinc oxide has structural, piezoelectric and optical properties for surface acoustic wave (SAW and bulk acoustic wave (BAW devices. Oxygen effficient films are transparent and insulating having wide applications for sensors and transducers. A rf sputtered piezoelectric ZnO layer transforms the mechanical deflection of a thin etched silicon diaphragm into a piezoelectric charge. For 25-micron thin diaphragm Si was etched in tetramethylammonium hydroxide solution using bulk micromachining. This was followed by deposition of sandwiched structure composed of bottom aluminum electrode, sputtered 3 micron ZnO film and top aluminum electrode. A glass having 1 mm diameter hole was bonded on backside of device to compensate sound pressure in side the cavity. The measured value of central capacitance and dissipation factor of the fabricated MEMS acoustic sensor was found to be 82.4pF and 0.115 respectively, where as the value of ~176 pF was obtained for the rim capacitance with a dissipation factor of 0.138. The response of the acoustic sensors was reproducible for the devices prepared under similar processing conditions under different batches. The acoustic sensor was found to be working from 30Hz to 8KHz with a sensitivity of 139µV/Pa under varying acoustic pressure.

  6. Superhard behaviour, low residual stress, and unique structure in diamond-like carbon films by simple bilayer approach

    International Nuclear Information System (INIS)

    Dwivedi, Neeraj; Kumar, Sushil; Malik, Hitendra K.

    2012-01-01

    Simple bilayer approach is proposed for synthesizing hard and superhard diamond-like carbon (DLC) coatings with reduced residual stress. For this, M/DLC bilayer (M = Ti and Cu) structures are grown using hybrid system involving radio frequency (RF)-sputtering and RF-plasma enhanced chemical vapor deposition techniques. Ti/DLC bilayer deposited at negative self bias of 100 V shows superhard behaviour with hardness (H) as 49 GPa. Cu/DLC bilayer grown at self bias of 100 V exhibits hard behaviour with H as 22.8 GPa. The hardness of Ti/DLC (Cu/DLC) bilayer gets changed from superhard (hard) to hard (moderate hard) regime, when the self bias is raised to 300 V. Residual stress in Ti/DLC (Cu/DLC) bilayer is found to be significantly low that varies in the range of 1 GPa-1.65 GPa (0.8 GPa-1.6 GPa). The microstructure and morphology are studied by Raman spectroscopy, scanning electron microscopy (SEM), and atomic force microscopy (AFM). SEM and AFM pictures reveal the creation of nanostructured features in the deposited bilayers. Raman, SEM, and AFM analyses are correlated with the nano-mechanical properties. Owing to excellent nano-mechanical properties, these bilayers can find their direct industrial applications as hard and protective coatings.

  7. FY 1992 report on the results of the R and D of advanced function creation processing technology. Development of technology to create high efficiency power generation use members; 1992 nendo senshin kino soshutsu kako gijutsu no kenkyu kaihatsu seika hokokusho. Kokoritsu hatsuden'yo buzai sosei gijutsu kaihatsu

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1993-03-01

    The paper described the FY 1992 results of the technology to create high efficiency power generation use members. To enhance characteristics of super-high property permanent magnet up to the theoretical level, the development was proposed of a technology to control the size/configuration of micro crystal phase in association with the crystallization of alloy amorphous. For the development of environmental purification use high functional catalysts, a refining method using laser excitation was studied. The observation was also made of molecular adsorption on the Pd thin film catalyst prepared by RF sputtering. The multi-source excitation plasma CVD was proposed which was film-formed by exciting plasma as raw gas independently for each component and supplying it to the substrate of which the periphery was separately controlled. The paper also described the development of technology for ion/light combined assist ultra-thin film production for development of gas turbine combustion sensor. The study was also made of the synthesis of higher-order structure controlled high functional organic materials using the electrode interface combined field which is composed of electrode reaction/high grade photon/extreme magnetic field. In the development of the higher-order structure control technology using the photon combined reaction field, studies were made of the photo reaction film formation technology, the basic film formation technology in the combined reaction field, and the molecular orientation technology. (NEDO)

  8. Preparation and optical properties of gold-dispersed BaTiO3 thin films

    Energy Technology Data Exchange (ETDEWEB)

    Kineri, T; Mori, M [TDK Corp., Tokyo (Japan). R and D Center; Kadono, K; Sakaguchi, T; Miya, M; Wakabayashi, H [Osaka National Research Inst., Osaka (Japan); Tsuchiya, T [Science Univ. of Tokyo, Tokyo (Japan). Faculty of Industrial Science and Technology

    1993-12-01

    Recently, metal or semiconductor-doped glasses were widely studied because of their large resonant third-order nonlinearity. These glasses are utilized in an optical information field as all optical logic devices in the future. The gold-doped glass films or thin layers have a large third-order nonlinear susceptibility [chi] and are prepared by r.f. sputtering method, etc. The optical properties, particularly the refractive index or dielectric constant of the matrix, are very important for the optical nonlinearity of these materials. In this study, gold-dispersed BaTiO3 thin films and gold-dispersed SiO2 thin films are prepared using r.f. magnetron sputtering method, and the optical properties of the films are compared. The [chi] of the films are measured and the effect of the matrix of the films on [chi] is investigated. The headings in the paper are: Introduction, Experimental procedure, Results, Discussion, and Conclusion. 13 refs., 9 figs.

  9. Properties of Nitrogen-Doped Zinc Telluride Films for Back Contact to Cadmium Telluride Photovoltaics

    Science.gov (United States)

    Shimpi, Tushar M.; Drayton, Jennifer; Swanson, Drew E.; Sampath, Walajabad S.

    2017-08-01

    Zinc telluride (ZnTe) films have been deposited onto uncoated glass superstrates by reactive radiofrequency (RF) sputtering with different amounts of nitrogen introduced into the process gas, and the structural and electronic transport properties of the resulting nitrogen-doped ZnTe (ZnTe:N) films characterized. Based on transmission and x-ray diffraction measurements, it was observed that the crystalline quality of the ZnTe:N films decreased with increasing nitrogen in the deposition process. The bulk carrier concentration of the ZnTe:N films determined from Hall-effect measurements showed a slight decrease at 4% nitrogen flow rate. The effect of ZnTe:N films as back contact to cadmium telluride (CdTe) solar cells was also investigated. ZnTe:N films were deposited before or after CdCl2 passivation on CdTe/CdS samples. Small-area devices were characterized for their electronic properties. Glancing-angle x-ray diffraction measurements and energy-dispersive spectroscopy analysis confirmed substantial loss of zinc from the samples where CdCl2 passivation was carried out after ZnTe:N film deposition.

  10. Dye-sensitized solar cell based on AZO/Ag/AZO multilayer transparent conductive oxide film

    International Nuclear Information System (INIS)

    Qi, Jin-He; Li, Ying; Duong, Thanh-Tung; Choi, Hyung-Jin; Yoon, Soon-Gil

    2013-01-01

    Highlights: ► AZO/Ag/AZO (AAA) multilayer was used for working electrode of DSSC cell. ► The 100 nm-thick Nb-doped TiO 2 layer showed a good blocking effect. ► The DSSC cell by AAA TCO material showed the highest efficiency of about 3.25%. -- Abstract: Niobium-doped TiO 2 blocking layer and Al-doped ZnO (AZO)/Ag/AZO (AAA) TCO layers were grown onto glass substrate using pulsed laser deposition (PLD) and direct current (dc)/radio-frequency (rf) sputtering at room temperature, respectively for dye-sensitized solar cell (DSSC) applications. The 100 nm-thick NTO layer showed a blocking effect for the oxygen diffusion into AAA layer and for the recombination of the electrons. The DSSC cell composed of the NTO (100 nm)/AAA (400 nm) showed the highest photo-electrical efficiency of about 3.25%. An insertion of aluminum foil between serrated clip and AAA (100 nm) TCO improved a photo-conversion efficiency of the DSSC

  11. Approach to Exchange Bias Effect in La2/3Ca1/3MnO3/BiFeO3 and BiFeO3/ La2/3Ca1/3MnO3 Bilayers

    Science.gov (United States)

    Dominguez, Claribel; Ordonez, John; Diez, Sandra; Gomez, Maria; Guénon, Stefan; Schuller, Ivan

    2013-03-01

    We have grown bilayers of ferromagnetic La2/3Ca1/3MnO3 (LCMO) and multiferroic BiFeO3 (BFO) on (100) SrTiO3 (STO) substrates, by DC- and magnetron RF -sputtering technique, respectively, at high-oxygen pressures. We maintain constant the thickness of the layers (tBFO=72nm; tLCMO=80nm). Temperature dependence of the resistivity indicates that the MI-transition temperature of the manganite in the BFO/LCMO/STO is affected by the presence of the BFO layer in comparison with TMI for the single LCMO layer. Furthermore, temperature dependence of magnetization shows that the BFO/LCMO/STO bilayer has higher Curie temperature than that for LCMO/BFO/STO, indicating a strong structural dependence of the LCMO layer with magnetic response. The dependence of the magnetic moment with magnetic field after field cooling gives indication of the existence of Exchange Bias effect in the LCMO/BFO/STO bilayer. Isothermal loops also display dependence of the Exchange Bias magnitude with field cooling. This work has been supported by UNIVALLE Research Project CI 7864, and ``El Patrimonio Autónomo Fondo Nacional de Financiamiento para CT&I FJC,'' Contract RC - No. 275-2011, COLCIENCIAS-CENM, Colombia

  12. Effects of phosphorus doping by plasma immersion ion implantation on the structural and optical characteristics of Zn{sub 0.85}Mg{sub 0.15}O thin films

    Energy Technology Data Exchange (ETDEWEB)

    Saha, S.; Nagar, S.; Chakrabarti, S., E-mail: subho@ee.iitb.ac.in [Department of Electrical Engineering, Indian Institute of Technology Bombay, Powai, Mumbai 400076 (India)

    2014-08-11

    ZnMgO thin films deposited on 〈100〉 Si substrates by RF sputtering were annealed at 800, 900, and 1000 °C after phosphorus plasma immersion ion implantation. X-ray diffraction spectra confirmed the presence of 〈101{sup ¯}0〉 and 〈101{sup ¯}3〉 peaks for all the samples. However, in case of the annealed samples, the 〈0002〉 peak was also observed. Scanning electron microscopy images revealed the variation in surface morphology caused by phosphorus implantation. Implanted and non-implanted samples were compared to examine the effects of phosphorus implantation on the optical properties of ZnMgO. Optical characteristics were investigated by low-temperature (15 K) photoluminescence experiments. Inelastic exciton–exciton scattering and localized, and delocalized excitonic peaks appeared at 3.377, 3.42, and 3.45 eV, respectively, revealing the excitonic effect resulting from phosphorus implantation. This result is important because inelastic exciton–exciton scattering leads to nonlinear emission, which can improve the performance of many optoelectronic devices.

  13. Band offsets in ITO/Ga2O3 heterostructures

    Science.gov (United States)

    Carey, Patrick H.; Ren, F.; Hays, David C.; Gila, B. P.; Pearton, S. J.; Jang, Soohwan; Kuramata, Akito

    2017-11-01

    The valence band offsets in rf-sputtered Indium Tin Oxide (ITO)/single crystal β-Ga2O3 (ITO/Ga2O3) heterostructures were measured with X-Ray Photoelectron Spectroscopy using the Kraut method. The bandgaps of the component materials in the heterostructure were determined by Reflection Electron Energy Loss Spectroscopy as 4.6 eV for Ga2O3 and 3.5 eV for ITO. The valence band offset was determined to be -0.78 ± 0.30 eV, while the conduction band offset was determined to be -0.32 ± 0.13 eV. The ITO/Ga2O3 system has a nested gap (type I) alignment. The use of a thin layer of ITO between a metal and the Ga2O3 is an attractive approach for reducing contact resistance on Ga2O3-based power electronic devices and solar-blind photodetectors.

  14. Sputtered gold-coated ITO nanowires by alternating depositions from Indium and ITO targets for application in surface-enhanced Raman scattering

    Energy Technology Data Exchange (ETDEWEB)

    Setti, Grazielle O. [Institute of Chemistry, University of Campinas, Campinas, P.O. Box 6154, 13083-970 Campinas, SP (Brazil); Renato Archer Information Technology Center, Rodovia Dom Pedro I (SP-65), Km 143,6 – Amarais, 13069-901 Campinas, SP (Brazil); Mamián-López, Mónica B.; Pessoa, Priscila R.; Poppi, Ronei J. [Institute of Chemistry, University of Campinas, Campinas, P.O. Box 6154, 13083-970 Campinas, SP (Brazil); Joanni, Ednan, E-mail: ednan.joanni@cti.gov.br [Renato Archer Information Technology Center, Rodovia Dom Pedro I (SP-65), Km 143,6 – Amarais, 13069-901 Campinas, SP (Brazil); Jesus, Dosil P. [Institute of Chemistry, University of Campinas, Campinas, P.O. Box 6154, 13083-970 Campinas, SP (Brazil)

    2015-08-30

    Graphical abstract: - Highlights: • ITO nanowires were grown by the sputtering method using a new synthesis procedure. • By changing the deposition parameters the morphology and dimensions of the nanostructures were modified. • Seed layer thickness was an important factor for obtaining branched nanowires. • SERS substrates having good performance and a high application potential were produced. • The first Raman results for our substrates are already comparable to commercial substrates. - Abstract: Indium Tin oxide (ITO) nanowires were deposited by RF sputtering over oxidized silicon using ITO and Indium targets. The nanowires grew on the substrate with a catalyst layer of Indium by the vapor–liquid–solid (VLS) mechanism. Modifications in the deposition conditions affected the morphology and dimensions of the nanowires. The samples, after being covered with gold, were evaluated as surface-enhanced Raman scattering (SERS) substrates for detection of dye solutions and very good intensifications of the Raman signal were obtained. The SERS performance of the samples was also compared to that of a commercial SERS substrate and the results achieved were similar. To the best of our knowledge, this is the first time ITO nanowires were grown by the sputtering technique using oxide and metal targets.

  15. Effects of thermal oxidation duration on the structural and electrical properties of Nd{sub 2}O{sub 3}/Si system

    Energy Technology Data Exchange (ETDEWEB)

    Hetherin, Karuppiah; Ramesh, S.; Wong, Yew Hoong [University of Malaya, Department of Mechanical Engineering, Faculty of Engineering, Kuala Lumpur (Malaysia)

    2017-08-15

    A study on the growth, structure and electrical properties of Nd{sub 2}O{sub 3} was carried out experimentally on RF sputtered thin film on Si followed by thermal oxidation at 700 C at different oxidation durations (5, 10, 15 and 20 min). The structural and chemical properties were studied by X-ray diffraction analysis, Fourier transform infrared analysis, Raman analysis and high resolution transmission electron microscopy analysis. The formation of cubic-Nd{sub 2}O{sub 3}, orthorhombic-Nd{sub 2}Si{sub 2}O{sub 7}, monoclinic-SiO{sub 2}, tetragonal-SiO{sub 2} and hexagonal-SiO{sub 2} was detected. A single interfacial layer was detected for the sample oxidized at 15 min and double interfacial layers were detected for the samples oxidized at 5, 10 and 20 min. The sample oxidized at 15 min possessed the best electrical properties which were attributed by the highest Nd{sub 2}O{sub 3} intensity, largest SiO{sub 2} crystallite structure, thinnest interfacial and oxide layer, highest barrier height, lowest effective oxide charges, slow trap density and average interface trap density. (orig.)

  16. Synthesis and characterization of boron-oxygen-hydrogen thin films at low temperatures

    International Nuclear Information System (INIS)

    Music, D.; Koelpin, H.; Atiser, A.; Kreissig, U.; Bobek, T.; Hadam, B.; Schneider, J.M.

    2005-01-01

    We have studied the influence of synthesis temperature on chemical composition and mechanical properties of X-ray amorphous boron-oxygen-hydrogen (B-O-H) films. These B-O-H films have been synthesized by RF sputtering of a B-target in an Ar atmosphere. Upon increasing the synthesis temperature from room temperature to 550 deg. C, the O/B and H/B ratios decrease from 0.73 to 0.15 and 0.28 to 0.07, respectively, as determined by elastic recoil detection analysis. It is reasonable to assume that potential sources of O and H are residual gas and laboratory atmosphere. The elastic modulus, as measured by nanoindentation, increases from 93 to 214 GPa, as the O/B and H/B ratios decreases within the range probed. Hence, we have shown that the effect of impurity incorporation on the elastic properties is extensive and that the magnitude of the incorporation is a strong function of the substrate temperature

  17. Nano-sized copper tungstate thin films as positive electrodes for rechargeable Li batteries

    International Nuclear Information System (INIS)

    Li Chilin; Fu Zhengwen

    2008-01-01

    Nano-sized CuWO 4 thin films have been fabricated by radio-frequency (R.F.) sputtering deposition, and are used as positive electrode with both LiClO 4 liquid electrolyte and LiPON solid electrolyte in rechargeable lithium batteries. An initial discharge capacity of 192 and 210 mAh/g is obtainable for CuWO 4 film electrode with and without coated LiPON in liquid electrolyte, respectively. An all-solid-state cell with Li/LiPON/CuWO 4 layers shows a high-volume rate capacity of 145 μAh/cm 2 μm in first discharge, and overcomes the unfavorable electrochemical degradation observed in liquid electrolyte system. A two-step reactive mechanism is investigated by both transmission electron microscopy and selected area electron diffraction techniques. Apart from the extrusion and injection of Cu 2+ /Cu 0 , additional capacity can be achieved by the reversible reactivity of (WO 4 ) 2- framework. The chemical diffusion coefficients of Li intercalation/deintercalation are estimated by cyclic voltammetry. Nano-CuWO 4 thin film is expected to be a promising positive electrode material for high-performance rechargeable thin-film lithium batteries

  18. Structure and Properties of La2O3-TiO2 Nanocomposite Films for Biomedical Applications

    Science.gov (United States)

    Zhang, Lin; Sun, Zhi-Hua; Yu, Feng-Mei; Chen, Hong-Bin

    2011-01-01

    The hemocompatibility of La2O3-doped TiO2 films with different concentration prepared by radio frequency (RF) sputtering was studied. The microstructures and blood compatibility of TiO2 films were investigated by scan electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and UV-visible optical absorption spectroscopy, respectively. With the increasing of the La2O3 concentrations, the TiO2 films become smooth, and the grain size becomes smaller. Meanwhile, the band gap of the samples increases from 2.85 to 3.3 eV with increasing of the La2O3 content in TiO2 films from 0 to 3.64%. La2O3-doped TiO2 films exhibit n-type semiconductor properties due to the existence of Ti2+ and Ti3+. The mechanism of hemocompatibility of TiO2 film doped with La2O3 was analyzed and discussed. PMID:22162671

  19. Poly(3,3-dibenzyl-3,4-dihydro-2H-thieno[3,4-b][1,4]dioxepine/Platinum Composite Films as Potential Counter Electrodes for Dye-Sensitized Solar Cells

    Directory of Open Access Journals (Sweden)

    Jung-Chuan Chou

    2017-07-01

    Full Text Available In this study, poly(3,3-dibenzyl-3,4-dihydro-2H-thieno[3,4-b][1,4]dioxepine/platinum composite films (PProDOT-Bz2/Pt were used as counter electrodes (CEs in dye-sensitized solar cells (DSSCs. The composite films were prepared on fluorine-doped tin oxide (FTO glass by radio frequency (RF sputtering to deposit platinum (Pt for 30 s. Afterwards, PProDOT-Bz2 was deposited on the Pt–FTO glass via electrochemical polymerization. The electron transfer process of DSSCs was investigated using electrochemical impedance spectroscopy (EIS and cyclic voltammetry (CV. The DSSCs with 0.05 C/cm2 PProDOT-Bz2-Pt composite films showed an open circuit voltage (Voc of 0.70 V, a short-circuit current density (Jsc of 7.27 mA/cm2, and a fill factor (F.F. of 68.74%. This corresponded to a photovoltaic conversion efficiency (η of 3.50% under a light intensity of 100 mW/cm2.

  20. Improve the conversion efficiency of Cu{sub 2}ZnSnSe{sub 4} solar cells using a novel molybdenum back contact structure

    Energy Technology Data Exchange (ETDEWEB)

    Sun, Ding [Institute of Photo Electronics thin Film Devices and Technology of Nankai University, Key Laboratory of Photoelectronic Thin Film Devices and Technology, Tianjin 300071 (China); School of Electrical and Computer Engineering, Jilin Jianzhu University, Changchun 130118 (China); Xu, Shengzhi; Zhang, Li; Wei, Changchun [Institute of Photo Electronics thin Film Devices and Technology of Nankai University, Key Laboratory of Photoelectronic Thin Film Devices and Technology, Tianjin 300071 (China); Li, Yuli; Chi, Yaodan [School of Electrical and Computer Engineering, Jilin Jianzhu University, Changchun 130118 (China); Zhao, Ying [Institute of Photo Electronics thin Film Devices and Technology of Nankai University, Key Laboratory of Photoelectronic Thin Film Devices and Technology, Tianjin 300071 (China); Zhang, Xiaodan, E-mail: xdzhang@nankai.edu.cn [Institute of Photo Electronics thin Film Devices and Technology of Nankai University, Key Laboratory of Photoelectronic Thin Film Devices and Technology, Tianjin 300071 (China)

    2017-08-15

    Highlights: • A new structure of Mo back contact was proposed. • The rough surface of Mo films gained diffuse reflectivity. • The performance of CZTSe cells were improved. - Abstract: A mixed RF/DC sputtering multilayer molybdenum (Mo) was realized to benefit different properties of films deposited in each mode. The bottom layer was deposited by RF sputtering to increase total reflectance and adherence, and the top layer was deposited by DC sputtering to modify the morphology of molybdenum films and increase light scattering. The morphologies of co-evaporated Cu{sub 2}ZnSnSe{sub 4} (CZTSe) films had not been reliably observed influenced by the top layer of Mo films. Only noticeable change was the lower reflectance of CZTSe films deposited on rough back contact which can be attributed to the diffuse reflection of back contact. The conversion efficiency of completed device is improved by using the novel Mo back contact, especially for the short-circuit current density (Jsc) about 11.7% enhancement.

  1. Optical properties of tungsten oxide thin films by non-reactive sputtering

    International Nuclear Information System (INIS)

    Acosta, M.; Gonzalez, D.; Riech, I.

    2009-01-01

    Tungsten oxide thin films were grown on glass substrates by RF sputtering at room temperature using a tungsten trioxide target for several values of the argon pressure (P Ar ). The structural and morphological properties of these films were studied using X-ray diffraction and atomic force microscopy. The as-deposited films were amorphous irrespective of the argon pressure, and crystallized in a mixture of hexagonal and monoclinic phases after annealing at a temperature of 350 o C in air. Surface-roughness increased by an order of magnitude (from 1 nm to 20 nm) after thermal treatment. The argon pressure, however, had a strong influence on the optical properties of the films. Three different regions are clearly identified: deep blue films for P Ar ≤ 2.67 Pa with low transmittance values, light blue films for 2.67 Pa Ar Ar ≥ 6 Pa with high transmittance values. We suggest that the observed changes in optical properties are due to an increasing number of oxygen vacancies as the growth argon pressure decreases.

  2. Magnetic properties of metastable bcc and fcc Fe-Cu alloys produced by vapor quenching

    International Nuclear Information System (INIS)

    Sumiyama, Kenji; Yoshitake, Tsutomu; Nakamura, Yoji

    1984-01-01

    High concentration Fesub(1-x)Cusub(x) alloys have been obtained by rf sputtering technique and investigated by X-ray diffraction and magnetization measurements. The bcc phase is extended over the region with x=0-0.4, while the fcc phase with x=0.6-1.0. For x=0.4-0.6, we have the mixed phase of bcc and fcc. The lattice constant of bcc phase increases slightly and that of fcc phase decreases with increasing x. In the bcc alloys, the average magnetic moment decreases with increasing x and deviates upwards from the simple dilution law. In the fcc alloys, the magnetic moment also decreases with increasing x but it deviates downwards from the simple dilution law. The Curie temperature, Tsub(c), of the Fesub(1-x)Cusub(x) alloys decreases abruptly with increasing x: Tsub(c) is higher than 750 K for the bcc alloys, while it is lower than 320 K for the fcc alloys and become 0 K at about x=0.92. (author)

  3. Titanium carbide coatings on molybdenum by means of reactive sputtering and electron beam techniques

    International Nuclear Information System (INIS)

    Obata, T.; Aida, H.; Hirohata, Y.; Mohri, M.; Yamashina, T.

    1982-01-01

    This study is an experimental investigation of TiC coatings on Mo substrate by means of a reactive r.f. sputtering in the presence of CH 4 and a chemical reaction with interdiffusion in the sandwich structure of Ti/C/Mo by electron beam evaporation and heating. Using the reactive sputtering method, a homogeneous TiC coating with stoichiometric composition and good adhesion could be produced in the conditions of the partial pressure range of CH 4 , 2 approx. equal to 5 x 10 -4 Torr (total pressure, Psub(Ar) + Psub(CH) 4 = 5.6 x 10 -2 Torr) at 300 0 C (substrate). By using the electron beams, successively evaporated carbon and Ti on a Mo substrate was heated to 700 0 C to form a TiC surface layer on the top which then remained stable during further heating to 1000 0 C. Godd adhesion was brought about by interdiffusion to produce Mo 2 C layer between TiC layer and Mo substrate. It was also found that further heating of the coating layers subsequent to Ti evaporation on the TiC layer produced thicker TiC layer due to a chemical reaction between Ti and inner carbon layers. This could be a promising method of in situ replenishment for TiC coatings on the first wall and the limiter materials. (orig.)

  4. Copper deposition on fabrics by rf plasma sputtering for medical applications

    International Nuclear Information System (INIS)

    Segura, G; Guzmán, P; Barrantes, Y; Navarro, G; Asenjo, J; Guadamuz, S; Vargas, VI; Zuñiga, P; Chaves, S; Chaves, J

    2015-01-01

    The present work is about preparation and characterization of RF sputtered Cu films on cotton by the usage of a Magnetron Sputter Source and 99.995% purity Cu target at room temperature. Cotton fabric samples of 1, 2 and 4 min of sputtering time at discharge pressure of 1×10 −2 Torr and distance between target and sample of 8 cm were used. The main goal was to qualitatively test the antimicrobial action of copper on fabrics. For that purpose, a reference strain of Escherichia Coli ATCC 35218 that were grown in TSA plates was implemented. Results indicated a decrease in the growth of bacteria by contact with Cu; for fabric samples with longer sputtering presented lower development of E. coli colonies. The scope of this research focused on using these new textiles in health field, for example socks can be made with this textile for the treatment of athlete's foot and the use in pajamas, sheets, pillow covers and robes in hospital setting for reducing the spread of microorganisms. (paper)

  5. Effect of surface microstructure and wettability on plasma protein adsorption to ZnO thin films prepared at different RF powers

    Energy Technology Data Exchange (ETDEWEB)

    Huang Zhanyun; Chen Min; Chen Dihu [State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-Sen University, Guangzhou 510275 (China); Pan Shirong, E-mail: stscdh@mail.sysu.edu.c [Artificial Heart Lab, the 1st Affiliate Hospital of Sun Yat-Sen University, Guangzhou 510080 (China)

    2010-10-01

    In this paper, the adsorption behavior of plasma proteins on the surface of ZnO thin films prepared by radio frequency (RF) sputtering under different sputtering powers was studied. The microstructures and surface properties of the ZnO thin films were investigated by x-ray diffraction (XRD), scanning electron microscopy (SEM), UV-visible optical absorption spectroscopy and contact angle techniques. The results show that the ZnO thin films have better orientation of the (0 0 2) peak with increasing RF power, especially at around 160 W, and the optical band gap of the ZnO films varies from 3.2 to 3.4 eV. The contact angle test carried out by the sessile drop technique denoted a hydrophobic surface of the ZnO films, and the surface energy and adhesive work of the ZnO thin films decreased with increasing sputtering power. The amounts of human fibrinogen (HFG) and human serum albumin (HSA) adsorbing on the ZnO films and reference samples were determined by using enzyme-linked immunosorbent assay (ELISA). The results show that fewer plasma proteins and a smaller HFG/HSA ratio adsorb on the ZnO thin films' surface.

  6. Photomodulated reflectance study on optical property of InN thin films grown by reactive gas-timing rf magnetron sputtering

    International Nuclear Information System (INIS)

    Porntheeraphat, S.; Nukeaw, J.

    2008-01-01

    The photoreflectance (PR) spectroscopy has been applied to investigate the band-gap energy (E g ) of indium nitride (InN) thin films grown by rf magnetron sputtering. A novel reactive gas-timing technique applied for the sputtering process has been successfully employed to grow InN thin films without neither substrate heating nor post annealing. The X-ray diffraction (XRD) patterns exhibit strong peaks in the orientation along (0 0 2) and (1 0 1) planes, corresponding to the polycrystalline hexagonal-InN structure. The band-gap transition energy of InN was determined by fitting the PR spectra to a theoretical line shape. The PR results show the band-gap energy at 1.18 eV for hexagonal-InN thin films deposited at the rf powers of 100 and 200 W. The high rf sputtering powers in combination with the gas-timing technique should lead to a high concentration of highly excited nitrogen ions in the plasma, which enables the formation of InN without substrate heating. Auger electron spectroscopy (AES) measurements further reveal traces of oxygen in these InN films. This should explain the elevated band-gap energy, in reference to the band-gap value of 0.7 eV for pristine InN films

  7. Formation and characterization of titanium nitride and titanium carbide films prepared by reactive sputtering

    International Nuclear Information System (INIS)

    Sundgren, J.-E.

    1982-01-01

    Titanium has been reactively r.f. sputtered in mixed Ar-N 2 and Ar-CH 4 discharges on to substrates held at 775 K. The films obtained have been characterized by scanning electron microscopy, X-ray diffraction and by measurements of hardness and electrical resistivity. The compositions of the films have been determined using Auger electron spectroscopy. The processes occurring both on substrates and target surfaces have been studied and it is shown that the latter is of great importance for the composition and structure of deposited films. Titanium nitride films of full density and with electrical resistivity and hardness values close to those of bulk TiN were only obtained in a narrow range close to the stoichiometric composition. Titanium carbide films grown on non-biased substrates were found to have an open structure and thus a low density. A bias applied to the substrate, however, improved the quality of the films. It is also shown that the heat of formation of the compounds plays an important role in the formation of carbides and nitrides. A large value promotes the development of large grains and dense structures. (Auth.)

  8. Glass-based confined structures enabling light control

    International Nuclear Information System (INIS)

    Chiappini, Andrea; Normani, Simone; Chiasera, Alessandro; Lukowiak, Anna; Vasilchenko, Iustyna; Ristic, Davor; Boulard, Brigitte; Dorosz, Dominik; Scotognella, Francesco; Vaccari, Alessandro; Taccheo, Stefano; Pelli, Stefano; Righini, Giancarlo C.; Conti, Gualtiero Nunzi; Ramponi, Roberta

    2015-01-01

    When a luminescent ion is confined in a system characterized by one or more specific properties such as spatial size, geometrical dimension and shape, refractive index, local crystal field, cut-off vibrational energy and so on, it's possible to control its emission. The control of branching ratios as a function of the composition, the luminescence enhancement induced by a photonic crystal, or the laser action in a microresonator, are well known examples of light control. Photonic glass-based structures are extremely viable systems to exploit the above mentioned properties and in our research team we have successfully fabricated luminescent photonic structures by different techniques, including sol-gel, rf sputtering, drawing, melting, and physical vapour deposition. Here we will discuss some of them with the aim to make the reader aware of the chemical-physical properties related to each specific system. We will demonstrate that glass ceramic waveguides in some cases present superior spectroscopic properties in respect to the parent glass, that compositional properties can play a positive role in reducing luminescence quenching and in developing novel planar waveguides and fibers, that colloids allow to obtain high internal quantum efficiency and that photonic crystals, microcavities and microresonators can enable the handling of the rare earth luminescence. Finally, the pros and cons of the systems and of the different techniques employed for their fabrication will be discussed and some perspectives concerning the glass photonics will be proposed looking at both possible applications and investigation of physical properties

  9. Application of pentacene thin-film transistors with controlled threshold voltages to enhancement/depletion inverters

    Science.gov (United States)

    Takahashi, Hajime; Hanafusa, Yuki; Kimura, Yoshinari; Kitamura, Masatoshi

    2018-03-01

    Oxygen plasma treatment has been carried out to control the threshold voltage in organic thin-film transistors (TFTs) having a SiO2 gate dielectric prepared by rf sputtering. The threshold voltage linearly changed in the range of -3.7 to 3.1 V with the increase in plasma treatment time. Although the amount of change is smaller than that for organic TFTs having thermally grown SiO2, the tendency of the change was similar to that for thermally grown SiO2. To realize different plasma treatment times on the same substrate, a certain region on the SiO2 surface was selected using a shadow mask, and was treated with oxygen plasma. Using the process, organic TFTs with negative threshold voltages and those with positive threshold voltages were fabricated on the same substrate. As a result, enhancement/depletion inverters consisting of the organic TFTs operated at supply voltages of 5 to 15 V.

  10. Effect of annealing on electrical properties of plasmatron deposited ZnO films

    International Nuclear Information System (INIS)

    Joa, Sang Beom; Penkov, Oteksiy V.; Plaksin, Vadim Yu; Mansur, Rakib; Kim, Ji Hun; Lee, Heon Ju

    2009-01-01

    Transparent conductive zinc oxide (ZnO) has been extensively studied in recent several years because they have very interesting properties. Besides this, zinc oxide is non-poisonous, abundant and cheap material. ZnO films are employed in different applications like transparent conductive layers in solar cells, protective coatings and so on. Wide industrial application of the ZnO films requires of development of cheap, effective and scalable technology. Typically used technology like RF sputtering, pyrolysis and metal-organic CVD don't completely satisfy the industrial requirements. In our previous publications the new perspective ZnO deposition technology based DC Arc Plasmatron was described. This technology has several advantages (low cost, high deposition rate, low substrate temperature). Currently, films deposited using this technology has can be used only as protective or insulation coatings because of very high resistance. Applying of plasmatron technology in the microelectronics or solar cell production requires the improvement of electrical properties of the films. This can be achieved by optimization of deposition parameters, using of doping, or by post-deposition treatment such as annealing, or by combination of mentioned. It was shown that proposed technology can be used for the deposition of pure ZnO film with good electrical and optical properties. Proposed technology has several disadvantages which can be overcome in the near-term outlook

  11. Optical properties of CuCdTeO thin films sputtered from CdTe-CuO composite targets

    Energy Technology Data Exchange (ETDEWEB)

    Mendoza-Galván, A., E-mail: amendoza@qro.cinvestav.mx [Cinvestav-IPN, Unidad Querétaro, Libramiento Norponiente 2000, 76230 Querétaro (Mexico); Laboratory of Applied Optics, Department of Physics, Chemistry and Biology, Linköping University, SE-581 83 Linköping (Sweden); Arreola-Jardón, G. [Cinvestav-IPN, Unidad Querétaro, Libramiento Norponiente 2000, 76230 Querétaro (Mexico); Karlsson, L.H.; Persson, P.O.Å. [Thin Film Physics Division, Department of Physics, Chemistry and Biology, Linköping University, SE-581 83 Linköping (Sweden); Jiménez-Sandoval, S. [Cinvestav-IPN, Unidad Querétaro, Libramiento Norponiente 2000, 76230 Querétaro (Mexico)

    2014-11-28

    The effective complex dielectric function (ε) of Cu and O containing CdTe thin films is reported in the spectral range of 0.05 to 6 eV. The films were fabricated by rf sputtering from targets comprised by a mixture of CdTe and CuO powders with nominal Cu and O concentrations in the range of 2–10 at.%. Low concentration levels improved the crystalline quality of the films. Spectroscopic ellipsometry and transmittance measurements were used to determine ε. The critical point energies E{sub 1}, E{sub 1} + Δ{sub 1}, and E{sub 2} of CdTe are red-shifted with the incorporation of Cu and O. Also, an absorption band is developed in the infrared range which is associated with a mixture of CdTe and low resistivity phases Cu{sub 2−x}Te according to an effective medium analysis. The elemental distribution of the films was mapped by energy dispersive X-ray spectroscopy using scanning transmission electron microscopy. - Highlights: • Incorporation of 2 to 10 at.% of Cu and O atoms in CdTe films • Improved crystalline quality with 2 and 3 at.% of Cu and O • Complex dielectric function of Cu and O containing CdTe thin films • Effective medium modeling of below band-gap absorption.

  12. Electrical and Optical Characterization of Sputtered Silicon Dioxide, Indium Tin Oxide, and Silicon Dioxide/Indium Tin Oxide Antireflection Coating on Single-Junction GaAs Solar Cells

    Directory of Open Access Journals (Sweden)

    Wen-Jeng Ho

    2017-06-01

    Full Text Available This study characterized the electrical and optical properties of single-junction GaAs solar cells coated with antireflective layers of silicon dioxide (SiO2, indium tin oxide (ITO, and a hybrid layer of SiO2/ITO applied using Radio frequency (RF sputtering. The conductivity and transparency of the ITO film were characterized prior to application on GaAs cells. Reverse saturation-current and ideality factor were used to evaluate the passivation performance of the various coatings on GaAs solar cells. Optical reflectance and external quantum efficiency response were used to evaluate the antireflective performance of the coatings. Photovoltaic current-voltage measurements were used to confirm the efficiency enhancement obtained by the presence of the anti-reflective coatings. The conversion efficiency of the GaAs cells with an ITO antireflective coating (23.52% exceeded that of cells with a SiO2 antireflective coating (21.92%. Due to lower series resistance and higher short-circuit current-density, the carrier collection of the GaAs cell with ITO coating exceeded that of the cell with a SiO2/ITO coating.

  13. A flexible Li-ion battery with design towards electrodes electrical insulation

    Science.gov (United States)

    Vieira, E. M. F.; Ribeiro, J. F.; Sousa, R.; Correia, J. H.; Goncalves, L. M.

    2016-08-01

    The application of micro electromechanical systems (MEMS) technology in several consumer electronics leads to the development of micro/nano power sources with high power and MEMS integration possibility. This work presents the fabrication of a flexible solid-state Li-ion battery (LIB) (~2.1 μm thick) with a design towards electrodes electrical insulation, using conventional, low cost and compatible MEMS fabrication processes. Kapton® substrate provides flexibility to the battery. E-beam deposited 300 nm thick Ge anode was coupled with LiCoO2/LiPON (cathode/solid-state electrolyte) in a battery system. LiCoO2 and LiPON films were deposited by RF-sputtering with a power source of 120 W and 100 W, respectively. LiCoO2 film was annealed at 400 °C after deposition. The new design includes Si3N4 and LiPO thin-films, providing electrode electrical insulation and a battery chemical stability safeguard, respectively. Microstructure and battery performance were investigated by scanning electron microscopy, electric resistivity and electrochemical measurements (open circuit potential, charge/discharge cycles and electrochemical impedance spectroscopy). A rechargeable thin-film and lightweight flexible LIB using MEMS processing compatible materials and techniques is reported.

  14. Photoluminescence of Cu(In,Ga)Se2 in the solar cell preparation process

    International Nuclear Information System (INIS)

    Sho, Shirakata; Shinji, Yudate; Jyunji, Honda; Naoki, Iwado

    2010-01-01

    Full text : Sequential step by step photoluminescence (PL) measurements have been carried out on Cu(In,Ga)Se 2 (CIGS) films just after each thin-film processes for the fabrication of the CIGS solar cell. These include, (i) the CIGS film deposition on the Mo-coated soda-lime glass substrate by three-stage method (CIGS/Mo/SLG), (ii) the chemical-bath deposition (CBD) of CdS buffer layer, (iii) deposition of undoped ZnO window layer by RF sputtering, (iv) deposition of Al doped ZnO high-conductive window layer by RF sputtering, (v) Al grid electrode deposition for the CIGS solar cell, and (vi) the mechanical scribing for the electrical isolation of small test cells. Roomtemperature PL measurements have been done with the excitation of a He-Ne laser (632.8 nm, 1 mW) focused on the sample surface to 0.2 mm diameter. PL was dispersed by a polycromator (Horiba: MicroHR) and detected by a cooled InGaAs multichannel detector (1024 pixels). In order to study the uniformity of PL within CIGS films, the two dimensional PL spectrum mapping measurement has been done (0.4-0.6 mm step) using an x-y stage operating in the raster scanning mode. Acquisition time of one PL spectrum was 1 s. Once the fresh CIGS film is exposed to the air, intensity of the near-band-edge PL decreases slowly with time. After few days, PL intensity was one order of magnitude weaker than its initial value. Thus, PL measurement was performed just after the deposition. It was shown that PL spectra of CIGS films taken for each process in the CIGS solar cell preparation. PL of the CIGS film exhibited nearband-edge peak at 1.18 eV. The slight increase of PL intensity was observed after depositions of CdS and ZnO films. After the high conductive ZnO:Al deposition, PL intensity decreases to one third of the initial PL intensity of the fresh CIGS film. No change has been observed with respect to the line shape of PL peaks during the process. In the CIGS solar cell (open circuit condition), PL intensity recovers

  15. Characterization of thin films of the solid electrolyte Li(x)Mg(1-2x)Al(2+x)O4 (x = 0, 0.05, 0.15, 0.25).

    Science.gov (United States)

    Put, Brecht; Vereecken, Philippe M; Mees, Maarten J; Rosciano, Fabio; Radu, Iuliana P; Stesmans, Andre

    2015-11-21

    RF-sputtered thin films of spinel Li(x)Mg(1-2x)Al(2+x)O4 were investigated for use as solid electrolyte. The usage of this material can enable the fabrication of a lattice matched battery stack, which is predicted to lead to superior battery performance. Spinel Li(x)Mg(1-2x)Al(2+x)O4 thin films, with stoichiometry (x) ranging between 0 and 0.25, were formed after a crystallization anneal as shown by X-ray diffraction and transmission electron microscopy. The stoichiometry of the films was evaluated by elastic recoil detection and Rutherford backscattering and found to be slightly aluminum rich. The excellent electronic insulation properties were confirmed by both current-voltage measurements as well as by copper plating tests. The electrochemical stability window of the material was probed using cyclic voltammetry. Lithium plating and stripping was observed together with the formation of a Li-Pt alloy, indicating that Li-ions passed through the film. This observation contradicted with impedance measurements at open circuit potential, which showed no apparent Li-ion conductivity of the film. Impedance spectroscopy as a function of potential showed the occurrence of Li-ion intercalation into the Li(x)Mg(1-2x)Al(2+x)O4 layers. When incorporating Li-ions in the material the ionic conductivity can be increased by 3 orders of magnitude. Therefore it is anticipated that the response of Li(x)Mg(1-2x)Al(2+x)O4 is more adequate for a buffer layer than as the solid electrolyte.

  16. A novel ITO/AZO/SiO2/p-Si frame SIS heterojunction fabricated by magnetron sputtering

    International Nuclear Information System (INIS)

    He, Bo; Wang, HongZhi; Li, YaoGang; Ma, ZhongQuan; Xu, Jing; Zhang, QingHong; Wang, ChunRui; Xing, HuaiZhong; Zhao, Lei; Rui, YiChuan

    2013-01-01

    Highlights: •Because the ITO/AZO double films lead to a great decrease of the lateral resistance. •The photon current can easily flow through top film entering the Cu front contact. •High photocurrent is obtained under a reverse bias. -- Abstract: The novel ITO/AZO/SiO 2 /p-Si SIS heterojunction has been fabricated by low temperature thermal oxidation an ultrathin silicon dioxide and RF sputtering deposition ITO/AZO double films on p-Si (1 0 0) polished substrate. The microstructural, optical and electrical properties of the ITO/AZO antireflection films were characterized by XRD, SEM, UV–VIS spectrophotometer, four point probe and Hall effect measurement, respectively. The results show that ITO/AZO films are of good quality. And XPS was carried out on the ultrathin SiO 2 film. The heterojunction shows strong rectifying behavior under a dark condition, which reveals that formation of a diode between AZO and p-Si. The ideality factor and the saturation current of this diode is 2.7 and 8.68 × 10 −5 A, respectively. High photocurrent is obtained under a reverse bias when the crystalline quality of ITO/AZO double films is good enough to transmit the light into p-Si. We can see that under reverse bias conditions the photocurrent of ITO/AZO/SiO 2 /p-Si SIS heterojunction is much higher than the photocurrent of AZO/SiO 2 /p-Si SIS heterojunction. Because the high quality crystallite and the good conductivity of ITO film which prepared by magnetron-sputtering on AZO film lead to a great decrease of the lateral resistance. The photon induced current can easily flow through ITO layer entering the Cu front contact. Thus, high photocurrent is obtained under a reverse bias

  17. Influence of the substrate and nitrogen amount on the microstructural and optical properties of thin r.f.-sputtered ZnO films treated by rapid thermal annealing

    Energy Technology Data Exchange (ETDEWEB)

    Nicolescu, Madalina [Institute of Physical Chemistry, Romanian Academy, Spl. Independentei 202, 060021 Bucharest (Romania); Anastasescu, Mihai, E-mail: manastasescu@icf.ro [Institute of Physical Chemistry, Romanian Academy, Spl. Independentei 202, 060021 Bucharest (Romania); Preda, S.; Stroescu, H.; Stoica, M. [Institute of Physical Chemistry, Romanian Academy, Spl. Independentei 202, 060021 Bucharest (Romania); Teodorescu, V.S. [National Institute of Material Physics, 105 bis Atomistilor Street, 077125 Bucharest-Magurele (Romania); Aperathitis, E.; Kampylafka, V. [FORTH-IESL, Crete (Greece); Modreanu, M. [Tyndall National Institute, University College Cork, Cork (Ireland); Zaharescu, M.; Gartner, M. [Institute of Physical Chemistry, Romanian Academy, Spl. Independentei 202, 060021 Bucharest (Romania)

    2012-11-15

    Highlights: Black-Right-Pointing-Pointer ZnO:N films are crystallized in hexagonal wurtzite phase (XRD), (0 0 2) oriented. Black-Right-Pointing-Pointer The presence of the Nitrogen in the RTA films is confirmed by EDX and XPS. Black-Right-Pointing-Pointer All ZnO:N films are highly transparent (over 80%) in VIS to NIR spectral range. Black-Right-Pointing-Pointer The frequency of the phonon modes, E{sub 1}(TO) and A{sub 1}(LO), were obtained by IRSE. - Abstract: N-doped ZnO (ZnO:N) thin films, intended to be used as one of the layers in solar cell applications were deposited by r.f. sputtering, using ZnN target (99.9% purity), on silicon and fused silica substrates. In the gas flow composition, Ar was kept constant (50%) and the O{sub 2}/N{sub 2} ratio was varied as: 40%/10%, 25%/25% and 10%/40%. After deposition, rapid thermal annealing (RTA) at 400 and 550 Degree-Sign C for 1 min in N{sub 2} ambient has been performed. The RTA impact on the optical and microstructural properties of ZnO:N thin films have been investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), transmission electron microscopy (TEM) coupled with selected area electron diffraction (SAED) and energy dispersive X-ray spectroscopy (EDX), UV-vis-NIR spectroscopy, UV-vis-NIR spectroscopic ellipsometry (SE) and infrared ellipsometry (IR-SE). The as-deposited (ad) ZnO:N films are polycrystalline with preferentially oriented columnar crystals. After RTA we found ZnO:N films with improved crystallinity and fewer boundary defects. We report optical constants of ZnO:N from UV to IR spectral range as well as the infrared active phononic modes.

  18. Faceting of (001) CeO2 Films: The Road to High Quality TFA-YBa2Cu3O7 Multilayers

    International Nuclear Information System (INIS)

    Coll, M; Gazquez, J; Sandiumenge, F; Pomar, A; Puig, T; Obradors, X; Espinos, J P; Gonzalez-Elipe, A R

    2006-01-01

    CeO 2 films are technologically important as a buffer layer for the integration of superconducting YBa 2 Cu 3 O 7 films on biaxially textured Ni substrates. The growth of YBa 2 Cu 3 O 7 layers on the CeO 2 cap layers by the trifluoroacetate (TFA) route remains a critical issue. To improve the accommodation of YBa 2 Cu 3 O 7 on CeO 2 , surface conditioning or CeO 2 is required. In this work we have applied ex-situ post-processes at different atmospheres to the CeO 2 layers deposited on YSZ single crystals using rf sputtering. XPS analysis showed that post-annealing CeO 2 layer in Ar/H 2 /H 2 O catalyses in an unexpected way the growth of (001)- terraces. We also report on the growth conditions of YBa 2 Cu 3 O 7 -TFA on CeO 2 buffered YSZ single crystal grown by chemical solution deposition and we compare them with those leading to optimized YBa 2 Cu 3 O 7 -TFA films on LaAlO 3 single crystals. Critical currents up to 1.6 MA/cm 2 at 77 K have been demonstrated in 300 nm thick YBa 2 Cu 3 O 7 layers on CeO 2 /YSZ system. The optimized processing conditions have then been applied to grow YBa 2 Cu 3 O 7 -TFA films on Ni substrates having vacuum deposited cap layers of CeO 2

  19. Study on the use of TiO{sub 2} passivation layer to reduce recombination losses in dye sensitized solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Eskander bin Samsudin, Adel; Mohamed, Norani Muti; Nayan, Nafarizal; Ali, Riyaz Ahmad Mohamed; Shariffuddin, Sharifah Amira Amir; Omar, Salwa [Electrical and Electronics Department, 31750, Tronoh, Universiti Teknologi PETRONAS (Malaysia); Fundamental and Applied Sciences Department, 31750, Tronoh, Universiti Teknologi PETRONAS (Malaysia); Electronic Engineering Department, Electrical and Electronic Engineering Faculty, Universiti Tun Hussein Onn Malaysia (UTHM) (Malaysia)

    2012-09-26

    A lot of research on various aspects of dye solar cells (DSC) has been carried out in order to improve efficiency. This paper analyzes the utilization of TiO{sub 2} passivation layers of different thicknesses by improving the electron transport properties. Four different thicknesses of passivation layers namely 10, 20, 50 and 100 nm were deposited onto the working electrode using r.f sputtering. The electrodes were assembled into TiO{sub 2} based DSC with active area of 1 cm{sup 2}. The solar performance was investigated using 100 mW/cm{sup 2} of AM 1.5 simulated sunlight from solar simulator. The kinetics of the solar cells was investigated using Electrochemical Impedance Spectroscopy (EIS) measurement and the spectral response was measured using Incident Photon to Electron Conversion (IPCE) measurement system. The highest efficiency was found for DSC with 20 nm passivation layer. DSCs with the passivation layer have open circuit voltage, V{sub OC} increased by 57 mV, their current density, J{sub SC} increased by 0.774 mA cm{sup -2} compared to the one without the passivation layer. The quantum efficiency of the 20 nm passivation layer is the highest, peaking at the wavelength of 534 nm, resulting in the highest performance. All DSCs with the passivation layer recorded higher ratio of R{sub BR}/R{sub T} where R{sub T} is the diffusion resistance of the TiO{sub 2} particles in the mesoscopic layer and R{sub BR} is the recombination resistance of the electron to the electrolyte. This implies that the recombination of the electrolyte I{sup -}{sub 3}/3I{sup -} couple at the substrate/electrolyte interface has been effectively reduced resulting in an enhanced efficiency.

  20. Investigation of optical and microstructural properties of RF magnetron sputtered PTFE films for hydrophobic applications

    International Nuclear Information System (INIS)

    Tripathi, S.; Haque, S. Maidul; Rao, K. Divakar; De, Rajnarayan; Shripathi, T.; Deshpande, U.; Ganesan, V.; Sahoo, N.K.

    2016-01-01

    Highlights: • Polytetrafluoroethylene films were made by RF sputtering by varying deposition time. • With increasing deposition time, thickness shows unusual trend due to backsputtering. • Major contribution of CF 2 and CF 3 bonds in the samples is seen by ATR-FTIR. • Deposition time influences film thickness but all samples remain hydrophobic. • XPS spectra show strong CF x bonds at the surface. - Abstract: The deposition time dependence of optical, structural and morphological properties of thin as well as ultrathin Polytetrafluoroethylene (PTFE) sputtered films have been explored in the present communication. The films were prepared by RF magnetron sputtering under high vacuum condition, as a function of deposition time. The ellipsometry as well as X-ray reflectivity data show a drastic reduction in film thickness as the deposition time increases from 5 s to 10 s, possibly as a consequence of back sputtering. With subsequent deposition, back sputtering component decreases and hence, thickness increases with increase in deposition time. Atomic force microscopy (AFM) images show a slight change in growth morphology although roughness is independent of deposition time. Attenuated total reflection Fourier transform infrared spectroscopy (ATR-FTIR) measurements showed the presence of C−C and CF x (x = 1–3) bonds in all the PTFE films. Supporting this, corresponding X-ray photoelectron spectroscopy (XPS) curves fitted for C-1s and F-1s peaks revealed a major contribution from CF 2 bonds along with significant contribution from CF 3 bonds leading to an F/C ratio of ∼1.5 giving hydrophobic nature of all the films.

  1. Measurement of residual stresses in deposited films of SOFC component materials

    Energy Technology Data Exchange (ETDEWEB)

    Kato, T.; Momma, A.; Nagata, S.; Kasuga, Y. [Electrotechnical Lab., Ibaraki (Japan)

    1996-12-31

    The stress induced in Solid oxide fuel cells (SOFC)s has important influence on the lifetime of SOFC. But the data on stress in SOFC and mechanical properties of SOW component materials have not been accumulated enough to manufacture SOFC. Especially, the data of La{sub 1-x}Sr{sub x}MnO{sub 3} cathode and La{sub 1-x}Sr{sub x}CrO{sub 3} interconnection have been extremely limited. We have estimated numerically the dependences of residual stress in SOFC on the material properties, the cell structure and the fabrication temperatures of the components, but these unknown factors have caused obstruction to simulate the accurate behavior of residual stress. Therefore, the residual stresses in deposited La{sub 1-x}Sr{sub x}MnO{sub 3} and La{sub 1-x}Sr{sub x}CrO{sub 3} films are researched by the observation of the bending behavior of the substrate strips. The films of SOFC component materials were prepared by the RF sputtering method, because: (1) It can fabricate dense films of poor sinterable material such as La{sub 1-x}Sr{sub x}CrO{sub 3} compared with sintering or plasma spray method. (2) For the complicated material such as perovskite materials, the difference between the composition of a film and that of a target material is generally small. (3) It can fabricate a thick ceramics film by improving of the deposition rate. For example, Al{sub 2}O{sub 3} thick films of 50{mu}m can be fabricated with the deposition rate of approximately 5{mu}m/h industrially. In this paper, the dependence of residual stress on the deposition conditions is defined and mechanical properties of these materials are estimated from the results of the experiments.

  2. Study on the use of TiO2 passivation layer to reduce recombination losses in dye sensitized solar cells

    International Nuclear Information System (INIS)

    Eskander bin Samsudin, Adel; Mohamed, Norani Muti; Nayan, Nafarizal; Ali, Riyaz Ahmad Mohamed; Shariffuddin, Sharifah Amira Amir; Omar, Salwa

    2012-01-01

    A lot of research on various aspects of dye solar cells (DSC) has been carried out in order to improve efficiency. This paper analyzes the utilization of TiO 2 passivation layers of different thicknesses by improving the electron transport properties. Four different thicknesses of passivation layers namely 10, 20, 50 and 100 nm were deposited onto the working electrode using r.f sputtering. The electrodes were assembled into TiO 2 based DSC with active area of 1 cm 2 . The solar performance was investigated using 100 mW/cm 2 of AM 1.5 simulated sunlight from solar simulator. The kinetics of the solar cells was investigated using Electrochemical Impedance Spectroscopy (EIS) measurement and the spectral response was measured using Incident Photon to Electron Conversion (IPCE) measurement system. The highest efficiency was found for DSC with 20 nm passivation layer. DSCs with the passivation layer have open circuit voltage, V OC increased by 57 mV, their current density, J SC increased by 0.774 mA cm −2 compared to the one without the passivation layer. The quantum efficiency of the 20 nm passivation layer is the highest, peaking at the wavelength of 534 nm, resulting in the highest performance. All DSCs with the passivation layer recorded higher ratio of R BR /R T where R T is the diffusion resistance of the TiO 2 particles in the mesoscopic layer and R BR is the recombination resistance of the electron to the electrolyte. This implies that the recombination of the electrolyte I − 3 /3I − couple at the substrate/electrolyte interface has been effectively reduced resulting in an enhanced efficiency.

  3. Ultraviolet light-absorbing and emitting diodes consisting of a p-type transparent-semiconducting NiO film deposited on an n-type GaN homoepitaxial layer

    Science.gov (United States)

    Nakai, Hiroshi; Sugiyama, Mutsumi; Chichibu, Shigefusa F.

    2017-05-01

    Gallium nitride (GaN) and related (Al,Ga,In)N alloys provide practical benefits in the production of light-emitting diodes (LEDs) and laser diodes operating in ultraviolet (UV) to green wavelength regions. However, obtaining low resistivity p-type AlN or AlGaN of large bandgap energies (Eg) is a critical issue in fabricating UV and deep UV-LEDs. NiO is a promising candidate for useful p-type transparent-semiconducting films because its Eg is 4.0 eV and it can be doped into p-type conductivity of sufficiently low resistivity. By using these technologies, heterogeneous junction diodes consisting of a p-type transparent-semiconducting polycrystalline NiO film on an n-type single crystalline GaN epilayer on a low threading-dislocation density, free-standing GaN substrate were fabricated. The NiO film was deposited by using the conventional RF-sputtering method, and the GaN homoepitaxial layer was grown by metalorganic vapor phase epitaxy. They exhibited a significant photovoltaic effect under UV light and also exhibited an electroluminescence peak at 3.26 eV under forward-biased conditions. From the conduction and valence band (EV) discontinuities, the NiO/GaN heterointerface is assigned to form a staggered-type (TYPE-II) band alignment with the EV of NiO higher by 2.0 eV than that of GaN. A rectifying property that is consistent with the proposed band diagram was observed in the current-voltage characteristics. These results indicate that polycrystalline NiO functions as a hole-extracting and injecting layer of UV optoelectronic devices.

  4. Implanted He retention and release from boronized layers

    International Nuclear Information System (INIS)

    Doyle, B.L.; Walsh, D.S.; Wampler, W.R.

    1992-01-01

    3 He has been implanted at an energy of 3 keV into amorphous hydrogenated boron-carbon (a-BC) films deposited by rf sputtering onto single crystal Si substrates. The initial composition of the films was analyzed by nuclear-enhanced backscattering spectrometry to be B 2 C with ∝20% H and ∝10% O. The areal density of the implanted and retained 3 He was measured in situ by a new ion beam analysis technique using the 3 He( 3 He, pp) three-body nuclear reaction. The He trapping or pumping efficiency at room temperature is only 3.4% for low fluence implants and the a-BC layer saturates with He at a fluence of 5x10 17 He/cm 2 . At this saturation fluence, only 3.1x10 15 He/cm 2 is retained in the film. Isochronal annealing of the implanted samples reveals a distributed release of implanted He at ∝200deg C, which corresponds to a trap activation energy of 1.65±0.25 eV. 3 He was trapped less efficiently at 250deg C than at room temperature and exhibited a saturated retention of 8.6x10 14 He/cm 2 . These results indicate that wall pumping should play only a minor role in the interpretation of the Textor He-pump experiment carried out earlier this year. The results also show that the unintentional deposition of a-Bc, onto He pumping plates could adversely affect the operation of such devices, and should therefore be avoided. (orig.)

  5. Thermal effect of Zn quantum dots grown on Si(111): competition between relaxation and reconstraint

    Science.gov (United States)

    Kao, Li-Chi; Huang, Bo-Jia; Zheng, Yu-En; Tu, Kai-Teng; Chiu, Shang-Jui; Ku, Ching-Shun; Lo, Kuang Yao

    2018-01-01

    Zn dots are potential solutions for metal contacts in future nanodevices. The metastable states that exist at the interface between Zn quantum dots and oxide-free Si(111) surfaces can suppress the development of the complete relaxation and increase the size of Zn dots. In this work, the actual heat consumption of the structural evolution of Zn dots resulting from extrinsic thermal effect was analyzed. Zn dots were coherently grown on oxide-free Si(111) through magnetron RF sputtering. A compensative optical method combined with reflective second harmonic generation and synchrotron x-ray diffraction (XRD) was developed to statistically analyze the thermal effect on the Zn dot system. Pattern matching (3 m) between the Zn and oxide-free Si(111) surface enabled Si(111) to constrain Zn dots from a liquid to solid phase. Annealing under vacuum induced smaller, loose Zn dots to be reconstrained by Si(111). When the size of the Zn dots was in the margin of complete relaxation, the Zn dot was partially constrained by potential barriers (metastable states) between Zn(111) and one of the six in-planes of Si〈110〉. The thermal disturbance exerted by annealing would enable partially constrained ZnO/Zn dots to overcome the potential barrier and be completely relaxed, which is obvious on the transition between Zn(111) and Zn(002) peak in synchrotron XRD. Considering the actual irradiated surface area of dots array in a wide-size distribution, the competition between reconstrained and relaxed Zn dots on Si(111) during annealing was statistically analyzed.

  6. Thin film battery/fuel cell power generating system. Final report, Task E-4, April 1976-April 1978

    Energy Technology Data Exchange (ETDEWEB)

    Feduska, W.

    1978-03-31

    A two-year researth program to design and demonstrate the technical feasibility of a high-temperature solid-electrolyte fuel cell is described in detail. A rare-earth chromite, in particular, La /sub 95/Mg /sub 05/Cr /sub 75/Al /sub 25/0/sub 3/ was identified, synthesized by RF-sputtering tested for resistivity, thermal expansion and inertness in contact with yttria-stabilized zirconia, and was found promising as a candidate interconnection material. Films of these interconnection materials have been successfully deposited onto stabilized zirconia tubes by electrochemical vapor deposition (EVD) and the technique has been used to fabricate such films in building fuel cell stacks. Tin-doped indium oxide and antimony-doped tin oxide air electrode current collector materials have been successfully (CVD) chemically vapor deposited, as thin films, onto zirconia tubes. Fabrication procedures for the preparation of thin films of the nickel-cermet fuel electrode and yttria-stabilized zirconia solid electrolyte have been re-verified and improved for use in preparing unit cells and cell stacks on the program. An in-house extrusion technology for porous calcia-stabilized zirconia tubes has been developed and has been used to provide suitable support tubes for component combination samples, unit cell and cell stack sample preparation. Test concepts for component combinations and for unit cells and cell stacks have been evolved, particularly, the crossed electrode technique, and test equipment has been designed, built and used to evaluate fuel cell components and their interfaces. A five-cell fuel cell stack has been fabricated and operated for 700 hours at 200 mA/cm/sup 2/ at 950 to 980/sup 0/C and was subjected to three temperature cycles during the testing. Three series connected cells of this five cell stack met the 80% voltage efficiency final target objective of the program (less than 10% voltage degradation in 700 hours - with only 300 hours required.)

  7. Growth of KOH etched AZO nanorods and investigation of its back scattering effect in thin film a-Si solar cell

    Science.gov (United States)

    Sharma, Jayasree Roy; Mitra, Suchismita; Ghosh, Hemanta; Das, Gourab; Bose, Sukanta; Mandal, Sourav; Mukhopadhyay, Sumita; Saha, Hiranmay; Barua, A. K.

    2018-02-01

    In order to increase the stabilized efficiencies of thin film silicon (TFS) solar cells it is necessary to use better light management techniques. Texturization by etching of sputtered aluminum doped zinc oxide (Al:ZnO or AZO) films has opened up a variety of promises to optimize light trapping schemes. RF sputtered AZO film has been etched by potassium hydroxide (KOH). A systematic study of etching conditions such as etchant concentration, etching time, temperature management etc. have been performed in search of improved electrical and optical performances of the films. The change in etching conditions has exhibited a noticeable effect on the structure of AZO films for which the light trapping effect differs. After optimizing the etching conditions, nanorods have been found on the substrate. Hence, nanorods have been developed only by chemical etching, rather than the conventional development method (hydrothermal method, sol-gel method, electrolysis method etc.). The optimized etched substrate has 82% transmittance, moderate haze in the visible range and sheet resistance ∼13 (Ω/□). The developed nanorods (optimized etched substrate) provide better light trapping within the cell as the optical path length has been increased by using the nanorods. This provides an effect on carrier collection as well as the efficiency in a-Si solar cells. Finite difference time domain (FDTD) simulations have been performed to observe the light trapping by AZO nanorods formed on sputtered AZO films. For a p-i-n solar cell developed on AZO nanorods coated with sputtered AZO films, it has been found through simulations that, the incident light is back scattered into the absorbing layer, leading to an increase in photogenerated current and hence higher efficiency. It has been found that, the light that passes through the nanorods is not getting absorbed and maximum amount of light is back scattered towards the solar cell.

  8. Effects of argon flow rate on electrical properties of amorphous indium gallium zinc oxide thin-film transistors

    Energy Technology Data Exchange (ETDEWEB)

    Sahoo, A.K.; Wu, G.M., E-mail: wu@mail.cgu.edu.tw

    2016-04-30

    In this report, amorphous indium gallium zinc oxide (a-IGZO) thin films were deposited on glass substrates using different argon flow rates (AFRs). The impact on the electrical properties of the a-IGZO thin-film transistors with various AFRs during film growth has been carefully investigated. The AFR varied 20–60 sccm while the oxygen flow rate was maintained at 1 sccm. All a-IGZO films achieved transmittance higher than 80% in the wavelength range of 350–1000 nm, and it increased slightly with increasing AFR in the higher wavelength region. The rise in partial pressure due to increased AFR could affect the performance, in particular by increasing the current on/off ratio, and changes in electron mobility, sub-threshold swing voltage and threshold voltage. The optimal results were attained at AFR of 50 sccm. The field effect mobility, sub-threshold swing, ratio of on-current to the off-current, interfacial trap density and threshold voltage are 27.7 cm{sup 2}/V·s, 0.11 V/dec, 2.9 × 10{sup 8}, 1.1 × 10{sup 12} cm{sup −2} eV{sup −1} and 0.84 V, respectively. In addition, good electrical properties were achieved using dielectric SiO{sub 2} prepared by simple, low-cost electron beam evaporator system. - Highlights: • IGZO thin films RF-sputtered on glass substrates under various Ar to oxygen flow rates • The electrical performances and thin film quality of a-IGZO TFT were characterized. • High mobility 27.7 cm{sup 2}/V·s and very small sub-threshold voltage 0.11 V/decade obtained. • Simple and low cost electron-beam deposited SiO{sub 2} used as gate dielectric. • Ohmic behavior of source–drain with channel material has been achieved.

  9. Influence of RF power on performance of sputtered a-IGZO based liquid crystal cells

    Energy Technology Data Exchange (ETDEWEB)

    Wu, G.M., E-mail: wu@mail.cgu.edu.tw; Sahoo, A.K.; Liu, C.Y.

    2015-12-01

    The influence of radio-frequency (RF) power on sputter-deposited amorphous indium gallium zinc oxide (a-IGZO) films and the corresponding liquid crystal cell performances have been investigated. The inorganic films were used as alternative alignment layers for liquid crystal display cells. The columnar growth of film was achieved by non-contact, fixed oblique deposition using RF sputtering at the power of 50 W, 60 W and 70 W. The experiments have been carried out to compare the physical characteristics with those of the traditional polyimide (PI) alignment layers used for liquid crystal cells. The cell performances in voltage-transmittance, contrast ratio, and response time were all evaluated. The liquid crystal pretilt angle has been determined to be about 13° using 70 W power deposited a-IGZO film. It was 6° for the 60 W deposited film and only 1.5° for the PI alignment film. The experimental cell rise time and fall time was 1.25 ms and 2.96 ms, respectively. Thus, a very quick response time of 4.21 ms has been achieved. It was about 6.62 ms for the PI alignment control cell. - Highlights: • Radio-frequency power of indium gallium zinc oxide film deposition was studied. • The oblique deposition technique was used to prepare the alignment layers. • The liquid crystal pretilt angle was about 13° using 70 W. • The corresponding liquid crystal cells exhibited fast response time at 4.21 ms. • The cells showed low threshold voltage of 1.78 V and excellent contrast ratio.

  10. Low-frequency noise properties in Pt-indium gallium zinc oxide Schottky diodes

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Jiawei; Zhang, Linqing; Ma, Xiaochen; Wilson, Joshua [School of Electrical and Electronic Engineering, University of Manchester, Manchester M13 9PL (United Kingdom); Jin, Jidong [Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool L69 3GJ (United Kingdom); Du, Lulu; Xin, Qian [School of Physics, Shandong University, Jinan 250100 (China); Song, Aimin, E-mail: A.Song@manchester.ac.uk [School of Electrical and Electronic Engineering, University of Manchester, Manchester M13 9PL (United Kingdom); School of Physics, Shandong University, Jinan 250100 (China)

    2015-08-31

    The low-frequency noise properties of Pt-indium gallium zinc oxide (IGZO) Schottky diodes at different forward biases are investigated. The IGZO layer and Pt contact were deposited by RF sputtering at room temperature. The diode showed an ideality factor of 1.2 and a barrier height of 0.94 eV. The current noise spectral density exhibited 1/f behavior at low frequencies. The analysis of the current dependency of the noise spectral density revealed that for the as-deposited diode, the noise followed Luo's mobility and diffusivity fluctuation model in the thermionic-emission-limited region and Hooge's empirical theory in the series-resistance-limited region. A low Hooge's constant of 1.4 × 10{sup −9} was found in the space-charge region. In the series-resistance-limited region, the Hooge's constant was 2.2 × 10{sup −5}. After annealing, the diode showed degradation in the electrical performance. The interface-trap-induced noise dominated the noise spectrum. By using the random walk model, the interface-trap density was obtained to be 3.6 × 10{sup 15 }eV{sup −1 }cm{sup −2}. This work provides a quantitative approach to analyze the properties of Pt-IGZO interfacial layers. These low noise properties are a prerequisite to the use of IGZO Schottky diodes in switch elements in memory devices, photosensors, and mixer diodes.

  11. (001) 3C SiC/Ni contact interface: In situ XPS observation of annealing induced Ni{sub 2}Si formation and the resulting barrier height changes

    Energy Technology Data Exchange (ETDEWEB)

    Tengeler, Sven, E-mail: stengeler@surface.tu-darmstadt.de [Institute of Material Science, Technische Universität Darmstadt, 64287 Darmstadt (Germany); Univ. Grenoble Alpes, CNRS, LMGP, F-38000 Grenoble (France); Kaiser, Bernhard [Institute of Material Science, Technische Universität Darmstadt, 64287 Darmstadt (Germany); Chaussende, Didier [Univ. Grenoble Alpes, CNRS, LMGP, F-38000 Grenoble (France); Jaegermann, Wolfram [Institute of Material Science, Technische Universität Darmstadt, 64287 Darmstadt (Germany)

    2017-04-01

    Highlights: • Schottky behavior (Φ{sub B} = 0.41 eV) and Fermi level pining were found pre annealing. • Ni{sub 2}Si formation was confirmed for 5 min at 850 °C. • 3C/Ni{sub 2}Si Fermi level alignment is responsible for ohmic contact behavior. • Wet chemical etching (Si–OH/C–H termination) does not impair Ni{sub 2}Si formation. - Abstract: The electronic states of the (001) 3C SiC/Ni interface prior and post annealing are investigated via an in situ XPS interface experiment, allowing direct observation of the induced band bending and the transformation from Schottky to ohmic behaviour for the first time. A single domain (001) 3C SiC sample was prepared via wet chemical etching. Nickel was deposited on the sample in multiple in situ deposition steps via RF sputtering, allowing observation of the 3C SiC/Ni interface formation. Over the course of the experiments, an upward band bending of 0.35 eV was observed, along with defect induced Fermi level pinning. This indicates a Schottky type contact behaviour with a barrier height of 0.41 eV. The subsequent annealing at 850 °C for 5 min resulted in the formation of a Ni{sub 2}Si layer and a reversal of the band bending to 0.06 eV downward. Thus explaining the ohmic contact behaviour frequently reported for annealed n-type 3C SiC/Ni contacts.

  12. (001) 3C SiC/Ni contact interface: In situ XPS observation of annealing induced Ni_2Si formation and the resulting barrier height changes

    International Nuclear Information System (INIS)

    Tengeler, Sven; Kaiser, Bernhard; Chaussende, Didier; Jaegermann, Wolfram

    2017-01-01

    Highlights: • Schottky behavior (Φ_B = 0.41 eV) and Fermi level pining were found pre annealing. • Ni_2Si formation was confirmed for 5 min at 850 °C. • 3C/Ni_2Si Fermi level alignment is responsible for ohmic contact behavior. • Wet chemical etching (Si–OH/C–H termination) does not impair Ni_2Si formation. - Abstract: The electronic states of the (001) 3C SiC/Ni interface prior and post annealing are investigated via an in situ XPS interface experiment, allowing direct observation of the induced band bending and the transformation from Schottky to ohmic behaviour for the first time. A single domain (001) 3C SiC sample was prepared via wet chemical etching. Nickel was deposited on the sample in multiple in situ deposition steps via RF sputtering, allowing observation of the 3C SiC/Ni interface formation. Over the course of the experiments, an upward band bending of 0.35 eV was observed, along with defect induced Fermi level pinning. This indicates a Schottky type contact behaviour with a barrier height of 0.41 eV. The subsequent annealing at 850 °C for 5 min resulted in the formation of a Ni_2Si layer and a reversal of the band bending to 0.06 eV downward. Thus explaining the ohmic contact behaviour frequently reported for annealed n-type 3C SiC/Ni contacts.

  13. Analysis of multiferroic properties in BiMnO3 thin films

    International Nuclear Information System (INIS)

    Grizalez, M; Mendoza, G A; Prieto, P

    2009-01-01

    Textured BiMnO 3 [111] thin films on SrTiO 3 (100) and Pt/TiO 2 /SiO 2 substrates were grown via r.f. magnetron sputtering (13.56 MHz). The XRD spectra confirmed a monoclinic structure and high-quality textured films for the BiMnO 3 films. The films grown on SrTiO 3 (100) showed higher crystalline quality than those developed on Pt/TiO 2 /SiO 2 . Through optimized oxygen pressure of 5x10 -2 mbar during the r.f. sputtering deposition, the crystalline orientation of the BiMnO 3 film was improved with respect to the previously reported value of 2x10 -1 mbar. The values of spontaneous polarization (P s ), remnant polarization (P r ), and coercive field (F c ) from ferroelectric hysteresis loops (P-E) at different temperatures were also obtained. Samples with higher crystalline order revealed better dielectric properties (high P s and P r values and a low F c ). For films on both types of substrates, the ferroelectric behavior was found to persist up to 400K. Measurements at higher temperatures were difficult to obtain given the increased conductivity of the films. Magnetic hysteresis loops from 5K to 120K were obtained for BiMnO 3 films grown on SrTiO 3 and Pt/TiO 2 /SiO 2 substrates. The results suggested that the coexistence of the magnetic and electric phases persists up to 120K.

  14. Black germanium selective absorber surfaces. Final technical report, September 1, 1978-June 30, 1979

    Energy Technology Data Exchange (ETDEWEB)

    Messier, R.; Vedam, K.; Krishnaswamy, S.V.

    1979-12-01

    Semiconductor films with an appropriate band gap (approx. 0.5 to 1.25 ev) have a high absorption coefficient in the solar spectrum region and high transmission in the IR thermal-emission region and thus make nearly ideal selective absorbers. However, due to their high refractive index, semiconductor films have high reflectance above their absorption edge which limits their total absorption. A coating which would retain the advantages of the semiconductor's selectivity and also reduce the reflectance from the present values of 30 to 50% to a level of less than 2% would be a significant advancement in the state of the art. This study describes work on the preparation and characterization of structurally anisotropic black Ge films by rf-sputtering and postdeposition etching. It has been shown that by controlling the sputtering preparation conditions of noncrystalline Ge films the surface microstructure can be drastically altered by simply etching in 30% H/sub 2/O/sub 2/. The total reflectance of the resulting surface was reduced from about 45% to less than 1%. Furthermore, the films appear black over a wide range of angles of incidence ( up to 45% from the normal). This flat black appearance is shown to be due to a dense array of aligned, needle-like protrusions which have an extremely high aspect ratio and both a cross-sectional area and a separation between the needles on th order of the wavelength of solar radiation. Black Ge films were obtained with a solar absorptance, ..cap alpha../sub S/, of greater than 0.99 in the best cases. Variation of ..cap alpha../sub S/ and epsilon/sub IR/ (IR emittance) with the thickness of the film and other preparation conditions is described. Further, the various microstructures are classified and understood on the basis of a structure zone model.

  15. A chemically stable PVD multilayer encapsulation for lithium microbatteries

    International Nuclear Information System (INIS)

    Ribeiro, J F; Sousa, R; Cunha, D J; Vieira, E M F; Goncalves, L M; Silva, M M; Dupont, L

    2015-01-01

    A multilayer physical vapour deposition (PVD) thin-film encapsulation method for lithium microbatteries is presented. Lithium microbatteries with a lithium cobalt oxide (LiCoO 2 ) cathode, a lithium phosphorous oxynitride (LiPON) electrolyte and a metallic lithium anode are under development, using PVD deposition techniques. Metallic lithium film is still the most common anode on this battery technology; however, it presents a huge challenge in terms of material encapsulation (lithium reacts with almost any materials deposited on top and almost instantly begins oxidizing in contact with atmosphere). To prove the encapsulation concept and perform all the experiments, lithium films were deposited by thermal evaporation technique on top of a glass substrate, with previously patterned Al/Ti contacts. Three distinct materials, in a multilayer combination, were tested to prevent lithium from reacting with protection materials and atmosphere. These multilayer films were deposited by RF sputtering and were composed of lithium phosphorous oxide (LiPO), LiPON and silicon nitride (Si 3 N 4 ). To complete the long-term encapsulation after breaking the vacuum, an epoxy was applied on top of the PVD multilayer. In order to evaluate oxidation state of lithium films, the lithium resistance was measured in a four probe setup (cancelling wires/contact resistances) and resistivity calculated, considering physical dimensions. A lithium resistivity of 0.16 Ω μm was maintained for more than a week. This PVD multilayer exonerates the use of chemical vapour deposition (CVD), glove-box chambers and sample manipulation between them, significantly reducing the fabrication cost, since battery and its encapsulation are fabricated in the same PVD chamber. (paper)

  16. Structural and optical properties of amorphous oxygenated iron boron nitride thin films produced by reactive co-sputtering

    International Nuclear Information System (INIS)

    Essafti, A.; Abouelaoualim, A.; Fierro, J.L.G.; Ech-chamikh, E.

    2009-01-01

    Amorphous oxygenated iron boron nitride (a-FeBN:O) thin films were prepared by reactive radio-frequency (RF) sputtering, from hexagonal boron nitride chips placed on iron target, under a total pressure of a gas mixture of argon and oxygen maintained at 1 Pa. The films were deposited onto silicon and glass substrates, at room temperature. The power of the generator RF was varied from 150 to 350 W. The chemical and structural analyses were investigated using X-ray photoelectron spectroscopy (XPS), energy dispersive of X-ray and X-ray reflectometry (XRR). The optical properties of the films were obtained from the optical transmittance and reflectance measurements in the ultraviolet-visible-near infrared wavelengths range. XPS reveals the presence of boron, nitrogen, iron and oxygen atoms and also the formation of different chemical bonds such as Fe-O, B-N, B-O and the ternary BNO phase. This latter phase is predominant in the deposited films as observed in the B 1s and N 1s core level spectra. As the RF power increases, the contribution of N-B bonds in the as-deposited films decreases. The XRR results show that the mass density of a-FeBN:O thin films increases from 2.6 to 4.12 g/cm 3 with increasing the RF power from 150 to 350 W. This behavior is more important for films deposited at RF power higher than 150 W, and has been associated with the enhancement of iron atoms in the film structure. The optical band gap decreases from 3.74 to 3.12 eV with increasing the RF power from 150 to 350 W.

  17. Oscillatory behavior of the magnetic properties of Nd–Fe–B films with Mo and Mo–Cu additions

    International Nuclear Information System (INIS)

    Urse, M.; Grigoras, M.; Lupu, N.; Borza, F.; Chiriac, H.

    2013-01-01

    A series of Ta/NdFeB/Ta thin films with Mo and Mo–Cu additions embedded by alloying and by stratification have been prepared by r.f. sputtering. The influence of additions, their embedding mode, and annealing temperature on the structural and magnetic behavior of Ta/NdFeB/Ta thin films is presented. The use of additions of Mo and Mo–Cu leads to refined grain structure and improvement in the hard magnetic characteristics of Ta/NdFeB/Ta thin films. The Ta/[NdFeBMo(540 nm)/Ta films and Ta/[NdFeB(180 nm)/MoCu(dnm)] × n/Ta multilayer films present enhanced coercivities and M r /M s ratios in comparison with the Ta/NdFeB(540 nm)/Ta films. The stratification of Ta/NdFeB/Ta thin films with Mo–Cu interlayers leads to an oscillatory behavior of hard magnetic characteristics of the Ta/[NdFeB(180 nm)/MoCu(dnm)] × n/Ta multilayer films, when the thickness, d, of Mo–Cu interlayers varies by increments of 1 nm. When the thickness of Mo–Cu interlayers varies by increments of 2 nm the oscillatory behavior of the magnetic characteristics is not revealed. For a thickness of the Mo–Cu interlayer of 3 nm in the Ta/[NdFeB(180 nm)/MoCu(3 nm)] × 3/Ta thin films annealed at 650 °C, the c-axis of part of the hard magnetic Nd 2 Fe 14 B grains is oriented out-of-plane

  18. A chemically stable PVD multilayer encapsulation for lithium microbatteries

    Science.gov (United States)

    Ribeiro, J. F.; Sousa, R.; Cunha, D. J.; Vieira, E. M. F.; Silva, M. M.; Dupont, L.; Goncalves, L. M.

    2015-10-01

    A multilayer physical vapour deposition (PVD) thin-film encapsulation method for lithium microbatteries is presented. Lithium microbatteries with a lithium cobalt oxide (LiCoO2) cathode, a lithium phosphorous oxynitride (LiPON) electrolyte and a metallic lithium anode are under development, using PVD deposition techniques. Metallic lithium film is still the most common anode on this battery technology; however, it presents a huge challenge in terms of material encapsulation (lithium reacts with almost any materials deposited on top and almost instantly begins oxidizing in contact with atmosphere). To prove the encapsulation concept and perform all the experiments, lithium films were deposited by thermal evaporation technique on top of a glass substrate, with previously patterned Al/Ti contacts. Three distinct materials, in a multilayer combination, were tested to prevent lithium from reacting with protection materials and atmosphere. These multilayer films were deposited by RF sputtering and were composed of lithium phosphorous oxide (LiPO), LiPON and silicon nitride (Si3N4). To complete the long-term encapsulation after breaking the vacuum, an epoxy was applied on top of the PVD multilayer. In order to evaluate oxidation state of lithium films, the lithium resistance was measured in a four probe setup (cancelling wires/contact resistances) and resistivity calculated, considering physical dimensions. A lithium resistivity of 0.16 Ω μm was maintained for more than a week. This PVD multilayer exonerates the use of chemical vapour deposition (CVD), glove-box chambers and sample manipulation between them, significantly reducing the fabrication cost, since battery and its encapsulation are fabricated in the same PVD chamber.

  19. Effect of Mg doping in ZnO buffer layer on ZnO thin film devices for electronic applications

    Science.gov (United States)

    Giri, Pushpa; Chakrabarti, P.

    2016-05-01

    Zinc Oxide (ZnO) thin films have been grown on p-silicon (Si) substrate using magnesium doped ZnO (Mg: ZnO) buffer layer by radio-frequency (RF) sputtering method. In this paper, we have optimized the concentration of Mg (0-5 atomic percent (at. %)) ZnO buffer layer to examine its effect on ZnO thin film based devices for electronic and optoelectronic applications. The crystalline nature, morphology and topography of the surface of the thin film have been characterized. The optical as well as electrical properties of the active ZnO film can be tailored by varying the concentration of Mg in the buffer layer. The crystallite size in the active ZnO thin film was found to increase with the Mg concentration in the buffer layer in the range of 0-3 at. % and subsequently decrease with increasing Mg atom concentration in the ZnO. The same was verified by the surface morphology and topography studies carried out with scanning electron microscope (SEM) and atomic electron microscopy (AFM) respectively. The reflectance in the visible region was measured to be less than 80% and found to decrease with increase in Mg concentration from 0 to 3 at. % in the buffer region. The optical bandgap was initially found to increase from 3.02 eV to 3.74 eV by increasing the Mg content from 0 to 3 at. % but subsequently decreases and drops down to 3.43 eV for a concentration of 5 at. %. The study of an Au:Pd/ZnO Schottky diode reveals that for optimum doping of the buffer layer the device exhibits superior rectifying behavior. The barrier height, ideality factor, rectification ratio, reverse saturation current and series resistance of the Schottky diode were extracted from the measured current voltage (I-V) characteristics.

  20. Structure of multilayered Cr(Al)N/SiO{sub x} nanocomposite coatings fabricated by differential pumping co-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Kawasaki, Masahiro [JEOL USA Inc., 11 Dearborn Road, Peabody, Massachusetts 01960 (United States); Nose, Masateru [Faculty of Art and Design, University of Toyama, 180 Futagami-machi, Takaoka 933-8588 (Japan); Onishi, Ichiro [JEOL Ltd. 3-1-2 Musashino, Akishima, Tokyo 196-8558 (Japan); Shiojiri, Makoto [Kyoto Institute of Technology, Kyoto 606-8585 (Japan)

    2013-11-11

    A Cr(Al)N/38 vol. % SiO{sub x} hard coating was prepared on a (001) Si substrate at 250 °C in a differential pumping co-sputtering system, which has two chambers for radio frequency (RF) sputtering and a substrate holder rotating on the chambers. The composite coating was grown by alternate sputter-depositions from CrAl and SiO{sub 2} targets with flows of N{sub 2}+Ar and Ar at RF powers of 200 and 75 W, respectively, on transition layers grown on the substrate. Analytical electron microscopy reveled that the Cr(Al)N/SiO{sub x} coating had a multilayered structure of Cr(Al)N crystal layers ∼1.6 nm thick and two-dimensionally dispersed amorphous silicon oxide (a-SiO{sub x}) particles with sizes of ∼1 nm or less. The a-SiO{sub x} particles were enclosed with the Cr(Al)N layers. The coating had a low indentation hardness of ∼25 GPa at room temperature, due to a high oxide fraction of 38 vol. % and a low substrate rotational speed of 1 rpm. Faster rotation and lower oxide fraction would make a-SiO{sub x} particles smaller, resulting in the formation of Cr(Al)N crystal including the very fine a-SiO{sub x} particles with small number density. They would work as obstacles for the lattice deformation of the Cr(Al)N crystals. We have fabricated a superhard coating of Cr(Al)N/17 vol. % SiO{sub x} with a hardness of 46 GPa prepared at 12 rpm.

  1. Hydrogen diffusion and microstructure in undoped and boron-dope hydrogenated amorphous silicon: An IR and SIMS study

    International Nuclear Information System (INIS)

    Mitra, S.

    1991-01-01

    Hydrogenated amorphous silicon (a-Si:H) prepared by rf sputtering of a polycrystalline Si target at various rf powers 50 ≤ P ≤ 550 W (0.27--2.97 W/cm 2 ), target to substrate distance 1 ≤ d ≤ 2 double-prime, and varying hydrogen partial pressures. Doping was accomplished by introducing diborane (B 2 H 6 ) in the plasma. Hydrogen diffusion was studied from the depth profiles obtained from the SIMS on multilayered a-Si:H/a-Si:(H,D)/a-Si:H samples. The properties of the samples were characterized by IR absorption, optical gap measurements and ESR. IR yielded quantitative and qualitative information total hydrogen content and the nature of the hydrogen bonding, respectively. Hence the hydrogen microstructure of the samples could be varied in a systematic manner and monitored from the hydrogen vibrational modes. The ESR gave information on the number of paramagnetic defects per unit volume in the samples. The IR absorption of both as-deposited and annealed samples were closely monitored and the results clearly demonstrate a strong correlation between hydrogen diffusion and its microstructure. It is shown that microvoids in a-Si:H play a critical role in the process of diffusion by inducing deep hydrogen trapping sites that render them immobile. Consequently, as the microvoid density increases beyond a critical density hydrogen diffusion is totally quenched. The diffusion results are discussed both in the context of multiple trapping transport of hydrogen in an exponential distribution of trapping sites and the floating bond model

  2. Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique

    Science.gov (United States)

    Song, Liang; Wang, Xianping; Wang, Le; Zhang, Ying; Liu, Wang; Jiang, Weibing; Zhang, Tao; Fang, Qianfeng; Liu, Changsong

    2017-04-01

    He-charged oxide dispersion strengthened (ODS) FeCrNi films were prepared by a radio-frequency (RF) plasma magnetron sputtering method in a He and Ar mixed atmosphere at 150 °C. As a comparison, He-charged FeCrNi films were also fabricated at the same conditions through direct current (DC) plasma magnetron sputtering. The doping of He atoms and Y2O3 in the FeCrNi films was realized by the high backscattered rate of He ions and Y2O3/FeCrNi composite target sputtering method, respectively. Inductive coupled plasma (ICP) and x-ray photoelectron spectroscopy (XPS) analysis confirmed the existence of Y2O3 in FeCrNi films, and Y2O3 content hardly changed with sputtering He/Ar ratio. Cross-sectional scanning electron microscopy (SEM) shows that the FeCrNi films were composed of dense columnar nanocrystallines and the thickness of the films was obviously dependent on He/Ar ratio. Nanoindentation measurements revealed that the FeCrNi films fabricated through DC/RF plasma magnetron sputtering methods exhibited similar hardness values at each He/Ar ratio, while the dispersion of Y2O3 apparently increased the hardness of the films. Elastic recoil detection (ERD) showed that DC/RF magnetron sputtered FeCrNi films contained similar He amounts (˜17 at.%). Compared with the minimal change of He level with depth in DC-sputtered films, the He amount decreases gradually in depth in the RF-sputtered films. The Y2O3-doped FeCrNi films were shown to exhibit much smaller amounts of He owing to the lower backscattering possibility of Y2O3 and the inhibition effect of nano-sized Y2O3 particles on the He element.

  3. Characterization of piesoelectric ZnO thin films and the fabrication of piezoelectric micro-cantilevers

    Energy Technology Data Exchange (ETDEWEB)

    Johnson, Raegan Lynn [Iowa State Univ., Ames, IA (United States)

    2005-01-01

    In Atomic Force Microscopy (AFM), a microcantilever is raster scanned across the surface of a sample in order to obtain a topographical image of the sample's surface. In a traditional, optical AFM, the sample rests on a bulk piezoelectric tube and a control loop is used to control the tip-sample separation by actuating the piezo-tube. This method has several disadvantages--the most noticeable one being that response time of the piezo-tube is rather long which leads to slow imaging speeds. One possible solution aimed at improving the speed of imaging is to incorporate a thin piezoelectric film on top of the cantilever beam. This design not only improves the speed of imaging because the piezoelectric film replaces the piezo-tube as an actuator, but the film can also act as a sensor. In addition, the piezoelectric film can excite the cantilever beam near its resonance frequency. This project aims to fabricate piezoelectric microcantilevers for use in the AFM. Prior to fabricating the cantilevers and also part of this project, a systematic study was performed to examine the effects of deposition conditions on the quality of piezoelectric ZnO thin films deposited by RF sputtering. These results will be presented. The deposition parameters that produced the highest quality ZnO film were used in the fabrication of the piezoelectric cantilevers. Unfortunately, the fabricated cantilevers warped due to the intrinsic stress of the ZnO film and were therefore not usable in the AFM. The complete fabrication process will be detailed, the results will be discussed and reasons for the warping will be examined.

  4. Effects of argon flow rate on electrical properties of amorphous indium gallium zinc oxide thin-film transistors

    International Nuclear Information System (INIS)

    Sahoo, A.K.; Wu, G.M.

    2016-01-01

    In this report, amorphous indium gallium zinc oxide (a-IGZO) thin films were deposited on glass substrates using different argon flow rates (AFRs). The impact on the electrical properties of the a-IGZO thin-film transistors with various AFRs during film growth has been carefully investigated. The AFR varied 20–60 sccm while the oxygen flow rate was maintained at 1 sccm. All a-IGZO films achieved transmittance higher than 80% in the wavelength range of 350–1000 nm, and it increased slightly with increasing AFR in the higher wavelength region. The rise in partial pressure due to increased AFR could affect the performance, in particular by increasing the current on/off ratio, and changes in electron mobility, sub-threshold swing voltage and threshold voltage. The optimal results were attained at AFR of 50 sccm. The field effect mobility, sub-threshold swing, ratio of on-current to the off-current, interfacial trap density and threshold voltage are 27.7 cm"2/V·s, 0.11 V/dec, 2.9 × 10"8, 1.1 × 10"1"2 cm"−"2 eV"−"1 and 0.84 V, respectively. In addition, good electrical properties were achieved using dielectric SiO_2 prepared by simple, low-cost electron beam evaporator system. - Highlights: • IGZO thin films RF-sputtered on glass substrates under various Ar to oxygen flow rates • The electrical performances and thin film quality of a-IGZO TFT were characterized. • High mobility 27.7 cm"2/V·s and very small sub-threshold voltage 0.11 V/decade obtained. • Simple and low cost electron-beam deposited SiO_2 used as gate dielectric. • Ohmic behavior of source–drain with channel material has been achieved.

  5. Emergent magnetism at transition-metal–nanocarbon interfaces

    Science.gov (United States)

    Al Ma’Mari, Fatma; Rogers, Matthew; Alghamdi, Shoug; Moorsom, Timothy; Lee, Stephen; Prokscha, Thomas; Luetkens, Hubertus; Valvidares, Manuel; Flokstra, Machiel; Stewart, Rhea; Ali, Mannan; Burnell, Gavin; Hickey, B. J.

    2017-01-01

    Charge transfer at metallo–molecular interfaces may be used to design multifunctional hybrids with an emergent magnetization that may offer an eco-friendly and tunable alternative to conventional magnets and devices. Here, we investigate the origin of the magnetism arising at these interfaces by using different techniques to probe 3d and 5d metal films such as Sc, Mn, Cu, and Pt in contact with fullerenes and rf-sputtered carbon layers. These systems exhibit small anisotropy and coercivity together with a high Curie point. Low-energy muon spin spectroscopy in Cu and Sc–C60 multilayers show a quick spin depolarization and oscillations attributed to nonuniform local magnetic fields close to the metallo–carbon interface. The hybridization state of the carbon layers plays a crucial role, and we observe an increased magnetization as sp3 orbitals are annealed into sp2−π graphitic states in sputtered carbon/copper multilayers. X-ray magnetic circular dichroism (XMCD) measurements at the carbon K edge of C60 layers in contact with Sc films show spin polarization in the lowest unoccupied molecular orbital (LUMO) and higher π*-molecular levels, whereas the dichroism in the σ*-resonances is small or nonexistent. These results support the idea of an interaction mediated via charge transfer from the metal and dz–π hybridization. Thin-film carbon-based magnets may allow for the manipulation of spin ordering at metallic surfaces using electrooptical signals, with potential applications in computing, sensors, and other multifunctional magnetic devices. PMID:28507160

  6. Emergent magnetism at transition-metal-nanocarbon interfaces.

    Science.gov (United States)

    Al Ma'Mari, Fatma; Rogers, Matthew; Alghamdi, Shoug; Moorsom, Timothy; Lee, Stephen; Prokscha, Thomas; Luetkens, Hubertus; Valvidares, Manuel; Teobaldi, Gilberto; Flokstra, Machiel; Stewart, Rhea; Gargiani, Pierluigi; Ali, Mannan; Burnell, Gavin; Hickey, B J; Cespedes, Oscar

    2017-05-30

    Charge transfer at metallo-molecular interfaces may be used to design multifunctional hybrids with an emergent magnetization that may offer an eco-friendly and tunable alternative to conventional magnets and devices. Here, we investigate the origin of the magnetism arising at these interfaces by using different techniques to probe 3d and 5d metal films such as Sc, Mn, Cu, and Pt in contact with fullerenes and rf-sputtered carbon layers. These systems exhibit small anisotropy and coercivity together with a high Curie point. Low-energy muon spin spectroscopy in Cu and Sc-C 60 multilayers show a quick spin depolarization and oscillations attributed to nonuniform local magnetic fields close to the metallo-carbon interface. The hybridization state of the carbon layers plays a crucial role, and we observe an increased magnetization as sp 3 orbitals are annealed into sp 2 -π graphitic states in sputtered carbon/copper multilayers. X-ray magnetic circular dichroism (XMCD) measurements at the carbon K edge of C 60 layers in contact with Sc films show spin polarization in the lowest unoccupied molecular orbital (LUMO) and higher π*-molecular levels, whereas the dichroism in the σ*-resonances is small or nonexistent. These results support the idea of an interaction mediated via charge transfer from the metal and dz -π hybridization. Thin-film carbon-based magnets may allow for the manipulation of spin ordering at metallic surfaces using electrooptical signals, with potential applications in computing, sensors, and other multifunctional magnetic devices.

  7. Influence of Ag thickness of aluminum-doped ZnO/Ag/aluminum-doped ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Wu, Hung-Wei, E-mail: hwwu@mail.ksu.edu.tw [Department of Computer and Communication, Kun Shan University, No. 949, Dawan Rd., Yongkang Dist., Tainan City 710, Taiwan (China); Yang, Ru-Yuan [Graduate Institute of Materials Engineering, National Pingtung University of Science and Technology, 1, Shuefu Rd., Neipu, Pingtung City 912, Taiwan (China); Hsiung, Chin-Min; Chu, Chien-Hsun [Department of Mechanical Engineering, National Pingtung University of Science and Technology, 1, Shuefu Rd., Neipu, Pingtung City 912, Taiwan (China)

    2012-10-01

    Highly conducting aluminum-doped ZnO (30 nm)/Ag (5-15 nm)/aluminum-doped ZnO (30 nm) multilayer thin films were deposited on glass substrate by rf magnetron sputtering (for top/bottom aluminum-doped ZnO films) and e-beam evaporation (for Ag film). The transmittance is more than 70% for wavelengths above 400 nm with the Ag layer thickness of 10 nm. The resistivity is 3.71 Multiplication-Sign 10{sup -4} {Omega}-cm, which can be decreased to 3.8 Multiplication-Sign 10{sup -5} {Omega}-cm with the increase of the Ag layer thickness to 15 nm. The Haacke figure of merit has been calculated for the films with the best value being 8 Multiplication-Sign 10{sup -3} {Omega}{sup -1}. It was shown that the multilayer thin films have potential for applications in optoelectronics. - Highlights: Black-Right-Pointing-Pointer High-quality Al-doped ZnO (AZO)/Ag/AZO Transparent Conducting Oxide films. Black-Right-Pointing-Pointer AZO films (30 nm) made by RF sputtering; E-beam evaporation for Ag film (5-15 nm). Black-Right-Pointing-Pointer Influence of Ag thickness on optical and electrical properties were analyzed. Black-Right-Pointing-Pointer High quality multilayer film with optimal intermediate Ag layer thickness of 10 nm. Black-Right-Pointing-Pointer 3.71 Multiplication-Sign 10{sup -4} {Omega}-cm resistivity, 91.89% transmittance at 470 nm obtained and reproducible.

  8. Analysis of multiferroic properties in BiMnO{sub 3} thin films

    Energy Technology Data Exchange (ETDEWEB)

    Grizalez, M [Universidad de la Amazonia, Florencia (Colombia); Mendoza, G A [Department of Physics, Universidad Nacional de Colombia, Bogota (Colombia); Prieto, P, E-mail: pprieto@calima.univalle.edu.c [Center of Excellence on Novel Materials - CENM (Colombia)

    2009-05-01

    Textured BiMnO{sub 3} [111] thin films on SrTiO{sub 3} (100) and Pt/TiO{sub 2}/SiO{sub 2} substrates were grown via r.f. magnetron sputtering (13.56 MHz). The XRD spectra confirmed a monoclinic structure and high-quality textured films for the BiMnO{sub 3} films. The films grown on SrTiO{sub 3} (100) showed higher crystalline quality than those developed on Pt/TiO{sub 2}/SiO{sub 2}. Through optimized oxygen pressure of 5x10{sup -2} mbar during the r.f. sputtering deposition, the crystalline orientation of the BiMnO{sub 3} film was improved with respect to the previously reported value of 2x10{sup -1} mbar. The values of spontaneous polarization (P{sub s}), remnant polarization (P{sub r}), and coercive field (F{sub c}) from ferroelectric hysteresis loops (P-E) at different temperatures were also obtained. Samples with higher crystalline order revealed better dielectric properties (high P{sub s} and P{sub r} values and a low F{sub c}). For films on both types of substrates, the ferroelectric behavior was found to persist up to 400K. Measurements at higher temperatures were difficult to obtain given the increased conductivity of the films. Magnetic hysteresis loops from 5K to 120K were obtained for BiMnO{sub 3} films grown on SrTiO{sub 3} and Pt/TiO{sub 2}/SiO{sub 2} substrates. The results suggested that the coexistence of the magnetic and electric phases persists up to 120K.

  9. Growth and characterization of tin oxide thin films and fabrication of transparent p-SnO/n-ZnO p–n hetero junction

    Energy Technology Data Exchange (ETDEWEB)

    Sanal, K.C., E-mail: sanalcusat@gmail.com [Nanophotonic and Optoelectronic Devices Laboratory, Department of Physics, Cochin University of Science and Technology, Kerala 682 022 (India); Inter University Center for Nanomaterials and Devices (IUCND), Cochin University of Science and Technology (India); Jayaraj, M.K. [Nanophotonic and Optoelectronic Devices Laboratory, Department of Physics, Cochin University of Science and Technology, Kerala 682 022 (India)

    2013-07-01

    Highlights: • Growth of p-type semiconducting SnO thin films by rf sputtering. • Varying the type of charge carriers with oxygen partial pressure. • Atomic percentage of SnO{sub x} thin films from the XPS analysis. • Demonstration of transparent p–n hetero junctions fabricated in the structure glass/ITO/n-ZnO/p-SnO. -- Abstract: p-Type and n-type tin oxide thin films were deposited by rf-magnetron sputtering of metal tin target by varying the oxygen pressure. Chemical composition of SnO thin film according to the intensity of the XPS peak is about 48.85% and 51.15% for tin and oxygen respectively. Nearest neighbor distance of the atoms calculated from SAED patterns is 2.9 Åand 2.7 Åfor SnO and SnO{sub 2} respectively. The Raman scattering spectrum obtained from SnO thin films showed two peaks, one at 113 cm{sup −1} and the other at 211 cm{sup −1}. Band gap of as-deposited SnO{sub x} thin films vary from 1.6 eV to 3.2 eV on varying the oxygen partial pressure from 3% to 30% which indicates the oxidization of metallic phase Sn to SnO and SnO{sub 2}. p-Type conductivity of SnO thin films and n-type conductivity of SnO{sub 2} thin films were confirmed through Hall coefficient measurement. Transparent p–n hetero junction fabricated in the structure glass/ITO/n-ZnO/p-SnO shows rectification with forward to reverse current ratio as 12 at 4.5 V.

  10. Graft Polymerization of Styrene to Polyethylene; Polymerisation par greffage du styrene sur des pellicules de polyethylene; Privitaya polimerizatsiya stirola k poliehtilen; Polimerizacion por injerto de estireno en polietileno

    Energy Technology Data Exchange (ETDEWEB)

    Silverman, J.; Srinivasan, S. I.; Phalangas, C. J. [Department of Chemical Engineering, University of Maryland, College Park, MD (United States)

    1963-11-15

    peliculas y borra d e polietileno para dosis de exposicion a rayos gamma de {sup 60}Co hasta 8,0 x 10{sup 5} r/h. Determinaron tambien la velocidad de transformacion del estireno en su homopoirmero, en las suspensiones de borra. Examinaron al microscopio las peliculas injertadas a fin de evaluar la proporcion de homopolfmero ocluido. Los resultados obtenidos indican que la mayor parte del incremento de peso en las muestras de pelicula corresponde al homopolfmero ocluido. En las pruebas con borra, en las cuales el incremento de peso se debe principalmente al copolimero injertado, dicho incremento es aproximadamente proporcional a la dosis y la velocidad de reaccion es casi proporcional a la rafe cuadrada de la intensidad de la dosis gamma. La reducida energia de activacion correspondiente a la velocidad de reaccion excluye la posibilidad de controlar la difusion en la borra y en las peliculas delgadas para intensidades de exposicion inferiores a 10{sup 5} r/h. En los experimentos con borra a 18{sup o}C e intensidades de 7,2 x 10{sup 4} r/h, la velocidad de formacion del homopolfmero coincide con el valor ya conocido para la polimerizacion del estireno puro. La energia de activacion, a saber, 3,5 kcal/mol, representa practicamente la mitad de la indicada para el monomero puro. (author) [Russian] Izuchenie opublikovannykh dannykh ob initsiirovannoj oblucheniem privitoj polimerizatsii stirola k plenkam poliehtilena nizkoj plotnosti pokazyvaet, tfgo skorost' prirosta vesa lish' neznachitel'no zavisit ot moshchnosti gamma-oblucheniya i tolshchiny plenki. Pokazano, chto modeli, primenyavshiesya ranee issledovatelyami dlya ob{sup y}asneniya dannykh prirosta vesa dlya otsenki konstant skorosti, ne godyatsya. Privedeny ehksperimental'nye dannye po privivaniyu pri temperaturakh 18{sup o}C i 40{sup o}C s ispol'zovaniem poliehtilenovykh plenok, legkoj melkokristallicheskoj kal'tsinirovannoj sody i istochnika Co{sup 60} s gamma-izlucheniem moshchnost'yu do 8,0 x 10{sup 5} r/ch. Izmerena

  11. Characterization of Hf/Mg co-doped ZnO thin films after thermal treatments

    Energy Technology Data Exchange (ETDEWEB)

    Li, Chih-Hung; Chung, Hantsun [Graduate Institute of Applied Mechanics, National Taiwan University, Taipei 10617, Taiwan (China); Chen, Jian-Zhang, E-mail: jchen@ntu.edu.tw [Graduate Institute of Applied Mechanics, National Taiwan University, Taipei 10617, Taiwan (China); Cheng, I-Chun, E-mail: iccheng@ntu.edu.tw [Graduate Institute of Photonics and Optoelectronics, Department of Electrical Engineering, National Taiwan University, Taipei 10617, Taiwan (China)

    2014-11-03

    Rf-sputtered Mg{sub 0.05}Zn{sub 0.95}O thin films become amorphous/nanocrystalline with the addition of hafnium oxide. All films (thickness: ∼ 100 nm) sputter-deposited from Hf{sub x}Mg{sub 0.05}Zn{sub 0.95−x}O targets are highly transparent (> 80%) from 400 to 800 nm. The Tauc bandgap ΔE (eV) increases with the Hf content. However, the bandgap decreases after thermal treatment. The reduction in the bandgap is positively correlated with the Hf content and annealing temperature. The residual stresses of films sputtered from Mg{sub 0.05}Zn{sub 0.95}O and Hf{sub 0.025}Mg{sub 0.05}Zn{sub 0.925}O targets are determined based on X-ray diffraction (XRD) data using a bi-axial stress model. The residual stresses of as-deposited films are compressive. As the annealing temperature increases, the residual stresses are relaxed and even become tensile. The bandgap narrowing after thermal treatment is attributed to the stress relaxation that changes the repulsion between the oxygen 2p and zinc 4s bands. Slight grain growth may also result in bandgap reduction because bandgap modification caused by the quantum confinement effect becomes significant in amorphous/nanocrystalline materials. The amorphous thin films reveal good thermal stability after 600 °C annealing for up to 2 h, as evidenced by the XRD and transmission spectra. - Highlights: • Thin films are sputtered from Hf{sub x}Mg{sub 0.05}Zn{sub 0.95−x}O targets at room temperature. • Bandgap increases with Hf content but decreases with post-annealing temperature. • Bandgap narrowing after annealing partly results from the relaxation of stresses. • Bandgap narrowing partly results from quantum confinement effect by nanomaterials. • Hf doping increases resistivity due to the lattice disorder and enlarged bandgap.

  12. TiCx thin films coatings prepared by reactive sputtering

    International Nuclear Information System (INIS)

    Saoula, N.; Handa, K.; Kesri, R.

    2004-01-01

    demonstrate clearly the great influence of the variation of different parameters (deposition time, RF power, total pressure, gas mixture (Ar+CH 4 ) on the film growth rates and thickness. The aim of present work is to study their influence of gas mixture, more specifically of carbon content on the structure, composition and the hardness of TiC coatings, prepared using an RF sputtering system

  13. Bandgap tailoring of in-situ nitrogen-doped TiO₂ sputtered films intended for electrophotocatalytic applications under solar light

    Energy Technology Data Exchange (ETDEWEB)

    Delegan, N.; El Khakani, M. A., E-mail: elkhakani@emt.inrs.ca [Institut National de la Recherche Scientifique, Centre Énergie, Matériaux et Télécommunications, 1650, Boulevard Lionel-Boulet, Varennes, Québec J3X-1S2 (Canada); Daghrir, R.; Drogui, P. [Institut National de la Recherche Scientifique, Centre Eau, Terre et Environnement, 490 Rue de la Couronne, Québec G1K-9A9 (Canada)

    2014-10-21

    We report on a reactive RF-sputtering process permitting the in-situ nitrogen doping of TiO₂ films in order to shift their photoactivity from UV to visible range. By carefully controlling the relative nitrogen-to-argon mass flow rate ratio (within the 0%–25% range) in the sputter deposition chamber, TiO₂:N films were grown with nitrogen contents ranging from 0 to 6.2 at. %, as determined by high-resolution X-ray spectroscopy measurements. A systematic investigation of the crystalline structure of the TiO₂:N films, as a function of their N content, revealed that low N contents (0.2–0.3 at. %) induce crystallization in the rutile phase while higher N contents (≥1.4 at. %) were accompanied with the recovery of the anatase structure with an average crystallite size of ~35 nm. By using both UV-Vis absorption and spectroscopic ellipsometry measurements, we were able to quantitatively determine the bandgap (E{sub g}) variation of the TiO₂:N films as a function of their N content. Thus, we have demonstrated that the E{sub g} of the TiO₂:N films effectively narrows from 3.2 eV down to a value as low as ~2.3 eV for the optimal N doping concentration of 3.4 at. % (higher N incorporation does not translate into further red shifting of the TiO₂:N films' E{sub g}). The photoactivity of the TiO₂:N films under visible light was confirmed through electro-photocatalytic decomposition of chlortetracycline (CTC, an emerging water pollutant) under standard 1.5AM solar radiation. Thus, CTC degradation efficiencies of up to 98% were achieved with 2 hours process cycles under simulated solar light. Moreover, the electro-photocatalytic performance of the TiO₂:N films is shown to be directly correlated to their optoelectronic properties (namely their bandgap narrowing).

  14. Wear Resistance Performance of Conventional and Non-Conventional Wind Turbine Blades with TiN Nano-Coating

    Directory of Open Access Journals (Sweden)

    Muhammad Hasibul Hasan

    2017-09-01

    augments with increasing impingement angles. Nano-coating (TiN by RF sputtering technique reduced the surface roughness significantly as oppose to uncoated samples. Highest roughness has been observed on uncoated blade surface collided with 0.3-0.69 mm diameter brown aluminium oxide particles.

  15. Efficient planar n-i-p type heterojunction flexible perovskite solar cells with sputtered TiO2 electron transporting layers.

    Science.gov (United States)

    Mali, Sawanta S; Hong, Chang Kook; Inamdar, A I; Im, Hyunsik; Shim, Sang Eun

    2017-03-02

    The development of hybrid organo-lead trihalide perovskite solar cells (PSCs) comprising an electron transporting layer (ETL), a perovskite light absorber and a hole transporting layer (HTL) has received significant attention for their potential in efficient PSCs. However, the preparation of a compact and uniform ETL and the formation of a uniform light absorber layer suffer from a high temperature processing treatment and the formation of unwanted perovskite islands, respectively. A low temperature/room temperature processed ETL is one of the best options for the fabrication of flexible PSCs. In the present work, we report the implementation of a room temperature processed compact TiO 2 ETL and the synthesis of extremely uniform flexible planar PSCs based on methylammonium lead mixed halides MAPb(I 1-x Br x ) 3 (x = 0.1) via RF-magnetron sputtering and a toluene dripping treatment, respectively. The compact TiO 2 ETLs with different thicknesses (30 to 100 nm) were directly deposited on a flexible PET coated ITO substrate by varying the RF-sputtering time and used for the fabrication of flexible PSCs. The photovoltaic properties revealed that flexible PSC performance is strongly dependent on the TiO 2 ETL thickness. The open circuit voltage (V OC ) and fill factor (FF) are directly proportional to the TiO 2 ETL thickness while the 50 nm thick TiO 2 ETL shows the highest current density (J SC ) of 20.77 mA cm -2 . Our controlled results reveal that the room temperature RF-magnetron sputtered 50 nm-thick TiO 2 ETL photoelectrode exhibits a power conversion efficiency (PCE) in excess of 15%. The use of room temperature synthesis of the compact TiO 2 ETL by RF magnetron sputtering results in an enhancement of the device performance for cells prepared on flexible substrates. The champion flexible planar PSC based on this architecture exhibited a promising power conversion efficiency as high as 15.88%, featuring a high FF of 0.69 and V OC of 1.108 V with a negligible

  16. Influence of post-hydrogenation upon electrical, optical and structural properties of hydrogen-less sputter-deposited amorphous silicon

    Energy Technology Data Exchange (ETDEWEB)

    Gerke, S., E-mail: sebastian.gerke@uni-konstanz.de [Department of Physics, University of Konstanz, Konstanz, 78457 (Germany); Becker, H.-W.; Rogalla, D. [RUBION — Central Unit for Ion Beams and Radioisotopes, University of Bochum, Bochum, 44780 (Germany); Singer, F.; Brinkmann, N.; Fritz, S.; Hammud, A.; Keller, P.; Skorka, D.; Sommer, D. [Department of Physics, University of Konstanz, Konstanz, 78457 (Germany); Weiß, C. [Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstraße 2, 79110 Freiburg (Germany); Flege, S. [Department of Materials Science, TU Darmstadt, Darmstadt 64287 (Germany); Hahn, G. [Department of Physics, University of Konstanz, Konstanz, 78457 (Germany); Job, R. [Department of Electrical Engineering and Computer Science, Münster University of Applied Sciences, Steinfurt 48565 (Germany); Terheiden, B. [Department of Physics, University of Konstanz, Konstanz, 78457 (Germany)

    2016-01-01

    further hydrogen diffusion experiments which require an initially unhydrogenated drain layer. - Highlights: • Post-hydrogenation of hydrogen-less RF sputter deposited a-Si • Hydrogen depth profiling of the ongoing post-hydrogenation process by NRRA • Determining diffusion coefficients of H and related diffusion mechanism • Analyze changes in elec., opt. and struct. properties of a-Si during post-hydro • Achieving surface passivation during post-hydrogenation of H-less deposited a-Si.

  17. Growth Al{sub x}Ga{sub 1−x}N films on Si substrates by magnetron sputtering and high ammoniated two-step method

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Xuewen, E-mail: wangxuew@nwu.edu.cn [School of Information Science and Technology, Northwest University, Xi' an 710127 (China); Su, Xingxing; Hu, Feng; He, Lin; He, Lewan; Zhang, Zhiyong; Zhao, Wu [School of Information Science and Technology, Northwest University, Xi' an 710127 (China); Wang, Kai-Ge; Wang, Shuang [Institute of Photonics & Photo-Technology, International Joint Research Centre of Photoelectric Technology & Nano-functional Materials and Application, Northwest University, Xi' an 710069 (China)

    2016-05-15

    In this paper, Al{sub x}Ga{sub 1−x}N films on Si substrates were synthesized with adjusting process parameters by magnetron sputtering and high ammoniated two-step method innovatively, while gallium oxide was used as gallium target, and aluminum was used as aluminum target, ammonia gas and nitrogen were used as nitrogen source. The influence of process parameters on the quality of Al{sub x}Ga{sub 1−x}N films was researched with X-ray diffraction (XRD), scanning electron microscope (SEM), and Energy Diffraction Spectrum (EDS) for the prepared samples. The results showed that Al{sub x}Ga{sub 1−x}N film can be grown on the Si substrate by magnetron sputtering and high ammoniated two-step method, and substrate temperature, sputtering power, nitrogen concentration also have a great impact on the quality of Al{sub x}Ga{sub 1−x}N film. The sample was developed along (002) peak preferred with high orientation at 200 °C. High-quality film could be grown when the x is 0.32 in Al{sub x}Ga{sub 1−x}N films grown in 300 °C substrate temperature, 150 W sputtering power and 50% nitrogen concentration conditions, which is used for gas sensitive sensor. And compared stress by the measurement of Raman with an excitation wavelength λ = 532 nm. The samples were tested by photoluminescence (PL), which indicated two light-emitting peaks at 405 nm and 645 nm when the excitation wavelength is 325 nm. The measure in Hall Effect Measurement System showed that the carrier concentration and mobility were changed with different Al components. - Highlights: • Grow Al{sub 0.32}Ga{sub 0.68}N films on Si by RF sputtering and high ammoniated two-step method. • The sample was developed along (002) peak preferred with high orientation at 200 °C. • The growth technics of the film was employed for the preparation of gas sensors. • Carrier concentration and mobility were changed with different Al components.

  18. RBS characterisation of SrxBa1-xNb2O6 (SBN) thin films obtained by laser deposition

    International Nuclear Information System (INIS)

    Pantelica, D.; Petris, M.; Negoita, F.; Dinescu, M.; Dinu, R.; Bauerle, D.; Pedarnig, J.; Bauer-Gogonea, S.; Bauer, S.

    1999-01-01

    Sr x Ba 1-x Nb 2 O 6 (SBN) is an attractive material for many applications such as nonvolatile ferroelectric random-access memories. SBN thin films have been grown by different techniques, such as solid source metalorganic chemical vapor deposition, liquid phase epitaxy, sol-gel synthesis and rf-sputter deposition. Pulsed laser deposition (PLD) is a relatively new growth technique which is ideally suited to the epitaxial growth of multicomponent oxides, because complex target compositions can be stoichiometrically reproduced at the substrate. Multilayer SBN/LSCO/TiN/MgO was prepared as follows: the (100) MgO substrate was glued onto a Ni holder with silver paint and the whole assembly was heated radiatively to the deposition temperatures in the range 450-800 deg. C. MgO substrates were annealed in oxygen at 1050 deg. C for 12 hours prior to the deposition of films. A UV-excimer laser (KrF, λ = 248 nm, t(FWHM) = 25 ns) operating at a repetition rate of 5 Hz was used for ablation. The laser fluence was varied between 0.8-2.6 J/cm 2 ; 4000 pulses were given for the deposition of LSCO film and 8000 pulses for the deposition of SBN film. The composition of the film was analysed using RBS. The measurements were conducted using a 7 Li ++ beam at 4.5 MeV provided by the Van de Graaff Tandem accelerator of IFIN-HH. An ordinary backscattering setup was used. The backscattered particles were detected using a passivated ion implanted silicon detector, placed at 145 angle with respect with the beam. The energy resolution for 7 Li at 4 MeV was about 30 keV. The sample surface was perpendicular to the beam direction. For the quantitative analysis of RBS spectra we used the code RUMP. A typical RBS spectrum of a SBN/LSCO/TiN/MgO sample is shown. A simulation is plotted on the same graph. The simulation curve fit well the experimental data. The profiles for different element are flat topped, indicating that the composition is constant with depth. The sharp high and low energy

  19. Magnetic dipolar coupling and collective effects for binary information codification in cost-effective logic devices

    International Nuclear Information System (INIS)

    Chiolerio, Alessandro; Allia, Paolo; Graziano, Mariagrazia

    2012-01-01

    Physical limitations foreshadow the eventual end to traditional Complementary Metal Oxide Semiconductor (CMOS) scaling. Therefore, interest has turned to various materials and technologies aimed to succeed to traditional CMOS. Magnetic Quantum dot Cellular Automata (MQCA) are one of these technologies. Working MQCA arrays require very complex techniques and an excellent control on the geometry of the nanomagnets and on the quality of the magnetic thin film, thus limiting the possibility for MQCA of representing a definite solution to cost-effective, high density and low power consumption device demand. Counter-intuitively, moving towards bigger sizes and lighter technologies it is still possible to develop multi-state logic devices, as we demonstrated, whose main advantage is cost-effectiveness. Applications may be seen in low cost logic devices where integration and computational power are not the main issue, eventually using flexible substrates and taking advantage of the intrinsic mechanical toughness of systems where long range interactions do not need wirings. We realized cobalt micrometric MQCA arrays by means of Electron Beam Lithography, exploiting cost-effective processes such as lift-off and RF sputtering that usually are avoided due to their low control on array geometry and film roughness. Information relative to the magnetic configuration of MQCA elements including their eventual magnetic interactions was obtained from Magnetic Force Microscope (MFM) images, enhanced by means of a numerical procedure and presented in differential maps. We report the existence of bi-stable magnetic patterns, as detected by MFM while sampling the z-component of magnetic induction field, arising from dipolar inter-element magnetostatic coupling, able to store and propagate binary information. This is achieved despite the array quality and element magnetic state, which are low and multi-domain, respectively. We discuss in detail shape, inter-element spacing and dot profile

  20. Band structure of Heusler compounds studied by photoemission and tunneling spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Arbelo Jorge, Elena

    2011-07-01

    Heusler compounds are key materials for spintronic applications. They have attracted a lot of interest due to their half-metallic properties predicted by band structure calculations. The aim of this work is to evaluate experimentally the validity of the predictions of half metallicity by band structure calculations for two specific Heusler compounds, Co{sub 2}FeAl{sub 0.3}Si{sub 0.7} and Co{sub 2}MnGa. Two different spectroscopy methods for the analysis of the electronic properties were used: Angular Resolved Ultraviolet Photoemission Spectroscopy (ARUPS) and Tunneling Spectroscopy. Heusler compounds are prepared as thin films by RF-sputtering in an ultra high vacuum system. For the characterization of the samples, bulk and surface crystallographic and magnetic properties of Co{sub 2}FeAl{sub 0.3}Si{sub 0.7} and Co{sub 2}MnGa are studied. X-ray and electron diffraction reveal a bulk and surface crossover between two different types of sublattice order (from B2 to L2{sub 1}) with increasing annealing temperature. X-ray magnetic circular dichroism results show that the magnetic properties in the surface and bulk are identical, although the magnetic moments obtained are 5 % below from the theoretically predicted. By ARUPS evidence for the validity of the predicted total bulk density of states (DOS) was demonstrated for both Heusler compounds. Additional ARUPS intensity contributions close to the Fermi energy indicates the presence of a specific surface DOS. Moreover, it is demonstrated that the crystallographic order, controlled by annealing, plays an important role on broadening effects of DOS features. Improving order resulted in better defined ARUPS features. Tunneling magnetoresistance measurements of Co{sub 2}FeAl{sub 0.3}Si{sub 0.7} and Co{sub 2}MnGa based MTJ's result in a Co{sub 2}FeAl{sub 0.3}Si{sub 0.7} spin polarization of 44 %, which is the highest experimentally obtained value for this compound, although it is lower than the 100 % predicted. For Co

  1. Comparison of Y{sub 2}O{sub 3}:Bi{sup 3+} phosphor thin films fabricated by the spin coating and radio frequency magnetron techniques

    Energy Technology Data Exchange (ETDEWEB)

    Jafer, R.M.; Yousif, A. [Department of Physics, University of the Free State, P.O. Box 339, Bloemfontein ZA 9300 (South Africa); Department of Physics, Faculty of Education, University of Khartoum, P.O. Box 321, Postal Code 11115 Omdurman (Sudan); Kumar, Vinod [Department of Physics, University of the Free State, P.O. Box 339, Bloemfontein ZA 9300 (South Africa); Photovoltaic Laboratory, Centre for Energy Studies, Indian Institute of Technology Delhi, New Delhi 110016 (India); Pathak, Trilok Kumar [Department of Physics, University of the Free State, P.O. Box 339, Bloemfontein ZA 9300 (South Africa); Semiconductor Physics Lab, Department of Physics, Gurukula Kangri University, Haridwar (India); Purohit, L.P. [Semiconductor Physics Lab, Department of Physics, Gurukula Kangri University, Haridwar (India); Swart, H.C., E-mail: swarthc@ufs.ac.za [Department of Physics, University of the Free State, P.O. Box 339, Bloemfontein ZA 9300 (South Africa); Coetsee, E., E-mail: CoetseeE@ufs.ac.za [Department of Physics, University of the Free State, P.O. Box 339, Bloemfontein ZA 9300 (South Africa)

    2016-09-15

    The reactive radio-frequency (RF) magnetron sputtering and spin coating fabrication techniques were used to fabricate Y{sub 2−x}O{sub 3}:Bi{sub x=0.5%} phosphor thin films. The two techniques were analysed and compared as part of investigations being done on the application of down-conversion materials for a Si solar cell. The morphology, structural and optical properties of these thin films were investigated. The X-ray diffraction results of the thin films fabricated by both techniques showed cubic structures with different space groups. The optical properties showed different results because the Bi{sup 3+} ion is very sensitive towards its environment. The luminescence results for the thin film fabricated by the spin coating technique is very similar to the luminescence observed in the powder form. It showed three obvious emission bands in the blue and green regions centered at about 360, 410 and 495 nm. These emissions were related to the {sup 3}P{sub 1}–{sup 1}S{sub 0} transition of the Bi{sup 3+} ion situated in the two different sites of the Y{sub 2}O{sub 3} matrix with I a-3(206) space group. Whereas the thin film fabricated by the radio frequency magnetron technique showed a broad single emission band in the blue region centered at about 416 nm. This was assigned to the {sup 3}P{sub 1}–{sup 1}S{sub 0} transition of the Bi{sup 3+} ion situated in one of the Y{sub 2}O{sub 3} matrix's sites with a Fm-3 (225) space group. The spin coating fabrication technique is suggested to be the best technique to fabricate the Y{sub 2}O{sub 3}:Bi{sup 3+} phosphor thin films. - Highlights: • RF sputtering and spin coating were used to fabricate Y{sub 2−x}O{sub 3}:Bi{sub x=0.5%} phosphor thin films. • XRD results of the two films showed cubic structures with different space groups. • PL showed different emission for the Bi{sup 3+} ions in the two films. • Three emission bands in the blue and green regions centered at about 360, 410 and 495 nm. • RF

  2. N +-implantation induced enhanced adhesion in WC1-x/Ti-6Al-4V

    Science.gov (United States)

    Laidani, Nadhira; Dorigoni, Carla; Miotello, Antonio

    1996-12-01

    In this work, the potentiality of the N +-implantation to promote adhesion in WC1-x/Ti-6Al-4V bilayers has been investigated. The WC 1- x films were deposited by rf sputtering in Ar discharge. N +-implantations were performed at 160 keV with ion dose ranging from 5 × 10 15 to 2 × 10 17N +/cm 2. The implantations have been carried out at two sample temperatures: 363 K and 423 K. Adhesion strength was measured by means of the scratch test in conjunction with scanning electron microscopy and energy dispersive spectrometry (EDS). Auger electron spectroscopy (AES), Rutherford backscattering spectrometry (RBS) and X-ray diffraction (XRD) analyses were used to study the chemical, compositional and structural changes of the WC1-x/Ti-6Al-4V interface. As a general result, N +-implantation modifies the adhesion failure mechanism which from adhesive, before implantation, becomes cohesive. The implantation temperature had a strong effect on the critical loads Lc. N +-implantation at 423 K resulted in a slight increase of Lc, from 2N (unimplanted systems) to 5N for all ion doses. This weak improvement of the adhesion strength was associated with the particular interface processes which allowed C, but not W, mixing into the substrate. In this case, TiC bondings formed which contributed to the substrate embrittlement. When the implantations were carried out at 363 K, both C and W underwent mixing with Ti-6Al-4V: this favoured not only an interface composition grading but also a graded chemistry across the interface, with a strong increase of Lc for low ion dose ( Lc = 14N for 1 × 10 16 N +/cm 2). Implantation with higher doses (5 × 10 16N -/cm 2 and 2 × 10 17N +/cm 2) exhibited lower efficiency ( Lc = 7N for 2 × 10 17 N +/cm 2). This ion dose dependence of the adhesion strength was attributed to the formation of different phases across the interface, probably structurally incompatible.

  3. Self-Absorption Studies with a 4 {pi} {beta}-Proportional Flow Counter; Etudes sur l'autoabsorption avec un compteur {beta} 4 {pi} proportionnel a courant; Izuchenie samopogloshcheniya pri pomoshchi {beta} proportsional'no-potochnogo 4 {pi} schetchika; Estudios sobre autoabsorcion con un contador de flujo proporcional {beta}4 {pi}

    Energy Technology Data Exchange (ETDEWEB)

    Yaffe, L; Fishman, J B [Radiochemistry Laboratory, Dept. of Chemistry, McGill University, Montreal, Quebec (Canada)

    1960-06-15

    entre 0,018 y 1,7 MeV) recogiendolos sobre finas peliculas de resina vinilica (VYNS) y han determinado las caracteristicas de autoabsorcion. Presentan una serie de curvas, obtenidas experimentalmente, que relacionan la E{sub max} el espesor de la fuente y la autoabsorcion. Les datos referentes a la autoabsorcion han sido sometidos a un analisis teorico, para contadores de angulo pequeno y 4 {pi}. Las curvas de autoabsorcion determinadas experimentalment e para contadores 4 {pi} estan comprendidas entre las curvas teoricas que corresponden a los angulos solidos pequenos y las curvas determinadas mediante contador de geometria 4 {pi}. (author) [Russian] Izuchenie samopogloshcheni {beta} izluchatelej provodilos' pri pomoshchi priemov, izlozhennykh Pejtom i YAffe v kanadskom khimicheskom zhurnale [Can. J. Chem. 34, 265 (1956]. Letuchie soedineniya H{sup 3}, S{sup 14}, So{sup 60}, Hg{sup 203}, As{sup 77} i P{sup 32} (E{sub max} ot 0,018 do 1,7 MeV) peregonyalis' na tonkie VYNS ustanovki i opredelyalas' kharakteristik a samopogloshcheniya . Privodyatsya serii s ehmpiri- cheskim opredeleniem krivykh, otnosyashchikhsya k E{sub max}, tolshchine istochnika i samopogloshchenie . Dannye samopogloshcheni ya podvergalis' teoreticheskom u analizu na schetchikakh s malym uglom i na 4 {pi} geometricheski kh schetchikakh. EHksperi- mental'no opredelennye krivye samopogloshcheni ya s pomoshch'yu 4 {pi} geometricheskikh schetchikov nakhodyatsya mezhdu krivymi, poluchennymi s pomoshch'yu schetchikov s teoreticheski malymi uglami i s pomoshch'yu 4 {pi} geometricheskikh schetchikov. (author)

  4. Synthesis of Graft Copolymers by Small Doses of Irradiation; Synthese des copolymeres greffes au moyen de petites doses de rayonnements; Sintez privitykh sopolimerov s pomoshch'yu malykh doz oblucheniya; Sintesis de copolimeros de injerto mediante pequenas dosis de radiacion

    Energy Technology Data Exchange (ETDEWEB)

    Dobo, J; Somogyi, M; Kiss, L

    1960-07-15

    laterales injertadas. Ello se traduce en una aceleracion, del proceso de injerto. Este efecto es especialmente pronunciado en el caso de los polimeros preformados, cuando la irradiacion es intermitente. El injerto de las moleculas de estireno puede acelerarse anadiendo algunos solventes que suprimen la accion protectora ejercida por el estireno sobre el polimero. Asimismo, el proceso puede acelerarse agregando otras sustancias. Al injertar moleculas de metacrilato de metilo en el polietileno, hemos conseguido un injerto de 6 400 por ciento con una dosis de 31 400 roentgens. Hemos examinado la estructura de los copolimeros asi obtenidos. (author) [Russian] Grafting (privivanie ) chasto soprovozhdaetsya nezhelatel'nym izmeneniem svojstv pervonachal'nogo polimera pri obluchenii monomernykh smesej polimera. Pod vozdejstviem oblucheniya grafting proiskhodit ne tol'ko v pervonachal'noj polimernoj osnove, no takzhe v bokovoj tsepi, uzhe podvergnuvshejsya graftingu. Grafting v rezul'tate ehtogo uskoryaetsya. EHtot ehffekt osobenno yarko vyrazhen v tverdykh polimerakh, esli obluchenie proizvoditsya periodicheski. Grafting stirola mozhet byt' uskoren dobavleniem nekotorykh rastvoritelej, kotorye blokiruyut zashchitnoe vozdejstvie stirola na dannyj polimer. Grafting mozhet byt' uskoren i drugimi additivami. Issleduyutsya kachestva nabukhaniya obluchennoj plenki. (author)

  5. Preparation of Films and Sources for 4{pi} Counting; Prigotovlenie dlya 4{pi}-scheta plenok i istochnikov

    Energy Technology Data Exchange (ETDEWEB)

    Konstantinov, A. A.; Sazonova, T. E. [Vsesojuznyj Nauchno - Isledovatel' skij Institut Im. D.I. Mendeleeva, Leningrad, SSSR (Russian Federation)

    1967-03-15

    To obtain a high degree of accuracy in determining the specific activity of sources by the absolute counting of particles with a 4{pi} counter, attention must be paid to the preparation of the radioactive sources. At the Mendeleev Institute of Metrology, celluloid films (surface density 8-10 {mu}/cm{sup 2}) coated on both sides with gold (10-15 {mu}g/cm{sup 2} ) or palladium (5-6 {mu}g/cm{sup 2}) are used as the bases of the radioactive sources. In order to reduce the correction for absorption of beta particles in the radioactive deposit, the base is specially treated with insulin. The authors present an extremely sensitive and effective method, employing the electron-capture nuclide {sup 54}Mn ({sup 54}Cr), for determining the uniform distribution of the active layer over the entire insulintreated surface. A solution of {sup 54}Mn ({sup 54}Cr) salt was applied to the insulin-tteated film, and the source of {sup 54}Cr ({sup 54}Mn) Auger K electrons thus obtained was investigated with the help of a proportional 4{pi} counter. The total number of {sup 54}Cr ({sup 54}Mn) Auger K electrons from the source was 8-12% less than the fluorescence coefficient (calculated from the number of {sup 54}Cr ({sup 54}Mn) K X-quanta emitted by the source) and the number of K electrons absorbed in the film (determined by the 'sandwich' method). From the differences, for insulintreated and untreated {sup 54}Mn ({sup 54}Cr) sources, between the calculated and recorded number of Auger electrons it is possible to reach a definite conclusion regarding the quality of the insulin treatment. (author) [Russian] Dlja poluchenija vysokoj tochnosti izmerenij pri opredelenii udel'noj aktivnosti istochnikov metodom absoljutnogo scheta chastic s pomoshh'ju 4{pi}- schetchika, bol'shoe vnimanie dolzhno byt' udeleno prigotovleniju radioaktivnyh istochnikov. Vo VNIIM v kachestve podlozhek radioaktivnyh istochnikov ispol'zujutsja celluloidnye plenki (poverhnostnaja plot- nost' 8-10 mkg/sm{sup 2

  6. Atomic-Scale Structure of the Tin DX Center and Other Related Defects in Aluminum Gallium Arsenide Semiconductors Using Moessbauer Spectroscopy.

    Science.gov (United States)

    Greco, Luigi Alessandro

    The DX center in III-V alloys has limited the use of these materials for electronic devices since the defect acts as an electron trap. To be able to control or eliminate the DX center, its atomic scale structure should be understood. Mossbauer spectroscopy has proven to be a valuable technique in probing the atomic-scale structure of certain atomic species. The dopant studied here is ^{119}Sn. The thermal diffusion of Sn in Al_ {rm x}Ga_{rm 1-x }As using different temperatures, times, sample geometries and As_4 overpressures in evacuated and sealed fused silica ampoules was studied by x-ray diffraction (XRD), secondary ion mass spectroscopy and electrochemical capacitance versus voltage measurements. The AlGaAs surfaces decomposed into various Sn, Si, Ga and As oxides when an As_4 overpressure was introduced during annealing. However, annealing under ambient As_4 and furnace cooling eliminated surface decomposition although the Sn diffusion depth was less than that for a 0.5 atm As_4 overpressure. SiO_{rm x} and Si_{rm x }N_{rm y} RF-sputtered thin film capping layers deposited on AlGaAs were studied by XRD and Auger electron spectroscopy. For the annealed SiO_{rm x} films the AlGaAs surface was preserved, independent of the cooling technique used. Mossbauer spectroscopy was conducted on ^{rm 119m} Sn-implanted Al_ {rm x } Ga_{rm 1-x} As (x = 0.22 and 0.25) used for the source experiments and ^{119}Sn-doped Al _{rm x}Ga _{rm 1-x}As (x = 0.15, N _{rm Sn} ~2 times 10 ^{18} cm^{ -3}) for the absorber experiment. The source samples were capped with 120 nm of SiO_ {rm x} to preserve the surface during the systematic study of annealing temperature versus site occupation and electrical activation via Mossbauer spectroscopy at 76 K and 4 K in the dark and in the light (to observe persistent photoconductivity (PPC) due to the DX center). For all of the annealing conditions used the x = 0.22 sample showed little evidence of PPC possibly due to compensating defects and

  7. Band offset in zinc oxy-sulfide/cubic-tin sulfide interface from X-ray photoelectron spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Sanal, K.C.; Nair, P.K.; Nair, M.T.S., E-mail: mtsn@ier.unam.mx

    2017-02-28

    Highlights: • Zinc oxy-sulfide thin films, 175–240 nm, deposited by rf-sputtering from targets of ZnO + ZnS. • Oxygen content in thin films is enhanced 3–4 times compared with that in ZnO:ZnS targets. • Thin film ZnO{sub x}S{sub 1−x} with x = 0.88–0.27 and optical band gap 2.8–3.2 eV is suitable for solar cells. • The conduction band offset with SnS of cubic structure studied by XPS are +0.41 to −0.28 eV. - Abstract: Zinc oxy-sulfide, ZnO{sub x}S{sub 1−x}, has been found to provide better band alignment in thin film solar cells of tin sulfide of orthorhombic crystalline structure. Here we examine ZnO{sub x}S{sub 1−x}/SnS-CUB interface, in which the ZnO{sub x}S{sub 1−x} thin film was deposited by radio frequency (rf) magnetron sputtering on SnS thin film of cubic (CUB) crystalline structure with a band gap (E{sub g}) of 1.72 eV, obtained via chemical deposition. X-ray photoelectron spectroscopy provides the valence band maxima of the materials and hence places the conduction band offset of 0.41 eV for SnS-CUB/ZnO{sub 0.27}S{sub 0.73} and −0.28 eV for SnS-CUB/ZnO{sub 0.88}S{sub 0.12} interfaces. Thin films of ZnO{sub x}S{sub 1−x} with 175–240 nm in thickness were deposited from targets prepared with different ZnO to ZnS molar ratios. With the target of molar ratio of 1:13.4, the thin films are of composition ZnO{sub 0.27}S{sub 0.73} with hexagonal crystalline structure and with that of 1:1.7 ratio, it is ZnO{sub 0.88}S{sub 0.12}. The optical band gap of the ZnO{sub x}S{sub 1−x} thin films varies from 2.90 eV to 3.21 eV as the sulfur to zinc ratio in the film increases from 0.12:1 to 0.73:1 as determined from X-ray diffraction patterns. Thus, band offsets sought for absorber materials and zinc oxy-sulfide in solar cells may be achieved through a choice of ZnO:ZnS ratio in the sputtering target.

  8. Reduced Cu(InGa)Se2 Thickness in Solar Cells Using a Superstrate Configuration

    Energy Technology Data Exchange (ETDEWEB)

    Shafarman, William N. [Univ. of Delaware, Newark, DE (United States)

    2015-03-30

    is incident through the substrate into the back of the absorber layer. The primary junction is then formed after Cu(InGa)Se2 deposition. This allows the potential benefits of superstrate cells for optical enhancement while maintaining processing advantages of the substrate configuration and avoiding the harmful effects of high temperature deposition on p-n junction formation. Backwall devices have outperformed substrate cells at absorber thicknesses of 0.1-0.5 µm through enhanced JSC due to easy incorporation of a Ag reflector and, with light incident on the absorber, the elimination of parasitic absorption in the CdS buffer. An efficiency of 9.7% has been achieved for a backwall Cu(InGa)Se2 device with absorber thickness ~0.4 μm. A critical achievement that enabled implementation of the backwall cell was the development of a transparent back contact using MoO3 or WO3. Processes for controlled deposition of each material by reactive rf sputtering from metal targets were developed. These contacts have wide bandgaps making them well-suited for application as contacts for backwall devices as well as potential use in bifacial cells and as the top cell of tandem CuInSe2-based devices. Optical enhancement will be critical for further improvements. Wet chemical texturing of ZnO films has been developed for a simple, low cost light-trapping scheme for backwall superstrate devices to enhance long wavelength quantum efficiency. An aqueous oxalic acid etch was developed and found to strongly texture sputtered ZnO with high haze ≈ 0.9 observed across the whole spectrum. And finally, advanced optical models have been developed to assist the characterization and optimization of Cu(InGa)Se2 cells with thin absorbers

  9. Determination of hydrogen concentration in a-Si and a-Ge layers by elastic recoil detection analysis

    International Nuclear Information System (INIS)

    Khanh, N.Q.; Serenyi, M.

    2010-01-01

    Compete text of publication follows. Hydrogenated amorphous Si and Ge films are of current interest in academic and industrial research due to their unique physical properties and important applications. The incorporation of hydrogen in the amorphous network is an accepted means for reducing the density of defect states in the midgap. The passivation of dangling-bonds leads to a significant improvement in the electronic and optical properties of these layers. However, hydrogen is also suspected to degrade the performance of amorphous Si and Ge material and devices. Several studies related to hydrogen motion have been proposed to explain the light and thermal degradation effect in these layers. Thus to improve the performance and reliability of these devices, it is crucially important to understand the role of hydrogen in amorphous layers. In our previous works the structural changes of hydrogenated a-Si/Ge multilayers as a function of annealing condition was investigated. It was shown that during annealing the samples underwent significant structural changes. Due to the fast out-diffusion of hydrogen from the layers prepared with high (6 ml/min) H 2 flow rate, bubbles and craters were created on the surface. However, in the multilayer samples prepared with hydrogen flow rate lower than 6 ml/min the macroscopic degradation by formation bubbles and craters was more moderated. The diffusion measurement shows that in these samples the structural degradation and intermixing of layers was slower than in the non-hydrogenated samples. As it was suggested the hydrogen can inactivate the dangling bonds of amorphous layers and, as a result of this, the intermixing slows down. It was also predicted that the hydrogen first released from the Ge layers because of the lower binding energy. In this work, we have studied the individual a-Si and a-Ge hydrogenated layers prepared by RF sputtering on Si (100) substrates. The absolute value of atomic content of the H was determined by

  10. Synthesis and Characterization of Sn2+- based and Bi3+- based metal oxides for photocatalytic applications

    KAUST Repository

    Noureldine, Dalal

    2016-07-01

    the compound at lower temperature. Next, the optoelectronic properties of α-SnWO4 structure were studied though a combination of experimental and theoretical approach. α-SnWO4 thin films were deposited by RF-sputtering. An interesting low band gap of ~ 1.95 eV was experimentally for direct band gap and 1.7 eV for indirect band gap, high dielectric constants and low electron effective masses in one crystallographic direction were obtained, exhibiting good charge separation and charge carrier transport of the charge carriers. The PEC performance was limited by the oxidation of Sn2+ in the material under applied potential. Finally, pyrochlore SnSb2O6 structure was synthesized utilizing soft hydrothermal method. The crystal structure was studied by Rietveld refinement and the position of Sn2+ was specified. The material showed interesting absorption edge around 700 which is promising for overall water splitting application.

  11. The Hanford Emergency Dosimetry System; Le Systeme de Dosimetrie pour les Cas d'Urgence a Hanford; 0421 0418 0421 0422 0414 ; El Sistema Dosimetrico de Hanford para Casos de Urgencia

    Energy Technology Data Exchange (ETDEWEB)

    Larson, H. V.; Keene, A. R. [Radiation Protection Operation, Hanford Laboratories, General Electric Company, Hanford Atomic Products Operation, Richland, WA (United States)

    1965-06-15

    dosimetros contienen laminas de los mismos elementos que el dosimetro de pelicula y constituyen un medio mas para calcular la dosis individual. (author) [Russian] Proekt v Hjenforde predstavljaet soboj bol'shoj atomnyj promyshlennyj kompleks, v kotoryj vhodjat jadernye reaktory, zavody po proizvodstvu teplovydeljajushhih jelementov, ustanovki dlja himicheskogo razdelenija i issledovatel'skie laboratorii. V dopolnenie k programme nabljudenija i kontrolirovanija radiacionnogo obluchenija personala razrabotana sistema avarijnogo dozimetricheskogo kontrolja s cel'ju obespechenija bystroj ocenki bol'shih doz, provedenija otbora sluzhashhih i kontrolja nad nimi, preduprezhdenija personala i sozdanija centrov avarijnogo kontrolja personala, ocenki vneshnih doz obluchenija, ocenki soderzhanija radioaktivnyh materialov v organizme, obnaruzhenija i regulirovanija zagrjaznenija okruzhajushhej sredy i bystrogo sostavlenija dannyh ob obluchenii v kachestve rukovodstva dlja personala skoroj pomoshhi i vrachej. Osnovnoj upor delaetsja na hjenfordskij plenochnyj dozimetr, kotoryj imeet pri sebe vse lica v predelah kontroliruemyh zon. Dozimetr obespechivaet pravil'noe vyjavlenie lichnosti vladel'ca, a ocenka plenki mozhet byt' provedena v techenie 90 minut. Razdel'no, i vmeste s tem odnovremenno, mozhno provesti obrabotku ostal'nyh sostavnyh chastej dozimetra s cel'ju opredelenija spektra nejtronov i velichiny dozy v pjati gruppah jenergii, a takzhe dat' bystruju ocenku nejtronnoj dozy pri odnokratnom stolknovenii, ot neskol'kih do tysjach rad. Gamma-luchi obnaruzhivajutsja v diapazone ot 20 millirentgen do 1500 rentgen (pri obrabotke komponentov plenki) i ot 10 do 10 000 rentgen (pri obrabotke jekranirovannyh tantalom ftoristyh sterzhnej). V avarijnuju sistemu vkljuchajutsja programmy, obespechivajushhie ponimanie sotrudnikami sistemy, podgotovku v oblasti dozimetrii i sotrudnichestvo s rukovodstvom v dele bystrogo vyjavlenija, kontrolirovanija i izolirovanija porazhennyh izlucheniem

  12. Hodoscope performance and design; Construction et comportement d'un odoscope; Demonstratsiya i konstruktsiya godoskopa; Diseno y caracteristicas de funcionamiento de un hodoscopio

    Energy Technology Data Exchange (ETDEWEB)

    Boyarski, A; Ritson, D [Massachusetts Institute of Technology, Cambridge, MA (United States)

    1962-04-15

    circuitos de un sistema de 200 contadores dispuestos para hodoscopia, que se ha empleado en Brookhaven para fines experimentales. Los circuitos, los transistores y los fototubos se mostraron sumamente estables a largo plazo. La vida de los transistores fue de 0,5 . 10{sup 8} horas, y solo uno de los 200 fototubos se estropeo a los 6 meses de funcionamiento. El correcto funcionamiento del aparato es comprobado en media hora por una sencilla serie de rutinas de diagnostico. Los autores registraron los datos en una pelicula que fue leida por un barrido programado en la calculadora TXO del Massachusetts Institute of Technology. Para leer 400 pies (122 metros) de pelicula por este sistema, se precisa una hora. Se ha introducido una pequena modificacion en el aparato, que ahora almacena los datos paralelamente en un registro de desplazamiento y los pasa en serie a una cinta magnetica. Este sistema escribe en cinta un suceso de 300 bits en un milisegundo y hace innecesario el almacenaje intermedio. (author) [Russian] Daetsya opisanie raboty i skhemy godoskopnoj sistemy iz dvukhsot schetchikov, primenennoj vo vremya opyta v Brukkhevene. Skhema, tranzistory i fotoehlementy obnaruzhili isklyuchitel'nuyu prodolzhitel'nost' dejstviya. Vremya zhizni poluprovodnikovogo trioda 0,5 x 10{sup 8} chasov, i tol'ko odin fotoehlement iz 200 iznosilsya posle trekhmesyachnogo ispol'zovaniya. Prostoj ryad diagnosticheskikh osmotrov pozvolyaet proveryat' rabotu apparata cherez kazhdye polchasa. Dannye zapisyvayutsya na plenku, kotoraya chitaetsya s pomoshch'yu perfroirovannogo razvertyvatelya na vychislitel'noj mashine TKHO Massachusetskogo tekhnologicheskogo instituta. Po ehtoj sisteme trebuetsya odin chas, chtoby prochitat' 400 futov plenki. Delaetsya prostoe izmenenie v apparate, posredstvom kotorogo dannye razmeshchayutsya parallel'no v registratore smeshcheniya i zatem seriyami zachityvayutsya na magnitofonnuyu lentu. Takaya sistema zapisyvaet 300 znakov na plenku v odnu millisekundu i

  13. Three dimensional MEMS supercapacitors

    Energy Technology Data Exchange (ETDEWEB)

    Sun, Wei

    2011-10-15

    and the specific power of 0.58 mWcm-2 at 20mVs-1 scan rate. The 3D MEMS supercapacitor fabricated in this project has the specific capacitance and the specific power of 0.029 F cm-2 and 2.2 mWcm-2 respectively at a relative large discharge rate of 5 m Acm-2. It is also found vi that the supercapacitors have the performance of broad frequency range up to 300Hz. For DRIE based 3D MEMS supercapacitor, the innovative designs were developed based on silicon micromachining process flow which includes the key processes such as thermal oxidation, RF sputtering, wet etching, DRIE, electroless plating and P Py polymerization. The optimized P Py electrode doping with Tos- performed ideal super capacitor properties in NaCl electrolyte. The single PPy electrode of the 3D MEMS supercapacitors can provide 0.128 F cm-2 specific capacitance and 1.28 mWcm-2 specific power at 20 mvs-1 scan rate. The specific capacitance of the 3D MEMS supercapacitors equals 0.056 F cm-2, and the specific power at 20 mvs-1 scan rate equals 0.56 mWcm-2. In addition, novel supercapacitors based on wafer level process are designed for flexible integration in applications such as high temperature electronics and hybrid power system for electric vehicles. Experimental work on TiO2 anodic oxidation, which enables the fabrication of the one of these designs, has been carried out. Dense TiO2 nano holes with diameters ranged from about 90 to 270 nm were obtained in 0.05 wt% HF aqueous solutions with two-step anodic oxidation method. Comparing to the published specific capacitance (about 2 mFcm-2) for microsupercapacitors [33], I have achieved much larger specific capacitance (typically 0.029 to 0.056 F cm-2) for 3D MEMS supercapacitors. The above results have been presented in 3 international conferences. Total 4 journal articles have been published, and one has been submitted. The article in the Journal of Power Source (appendix 3) has been cited 9 times after published in April 2009, and the article in

  14. PREFACE: Semiconducting oxides Semiconducting oxides

    Science.gov (United States)

    Catlow, Richard; Walsh, Aron

    2011-08-01

    their help in producing this special section. We hope that it conveys some of the excitement and significance of the field. Semiconducting oxides contents Chemical bonding in copper-based transparent conducting oxides: CuMO2 (M = In, Ga, Sc) K G Godinho, B J Morgan, J P Allen, D O Scanlon and G W Watson Electrical properties of (Ba, Sr)TiO3 thin films with Pt and ITO electrodes: dielectric and rectifying behaviourShunyi Li, Cosmina Ghinea, Thorsten J M Bayer, Markus Motzko, Robert Schafranek and Andreas Klein Orientation dependent ionization potential of In2O3: a natural source for inhomogeneous barrier formation at electrode interfaces in organic electronicsMareike V Hohmann, Péter Ágoston, André Wachau, Thorsten J M Bayer, Joachim Brötz, Karsten Albe and Andreas Klein Cathodoluminescence studies of electron irradiation effects in n-type ZnOCasey Schwarz, Yuqing Lin, Max Shathkin, Elena Flitsiyan and Leonid Chernyak Resonant Raman scattering in ZnO:Mn and ZnO:Mn:Al thin films grown by RF sputteringM F Cerqueira, M I Vasilevskiy, F Oliveira, A G Rolo, T Viseu, J Ayres de Campos, E Alves and R Correia Structure and electrical properties of nanoparticulate tungsten oxide prepared by microwave plasma synthesisM Sagmeister, M Postl, U Brossmann, E J W List, A Klug, I Letofsky-Papst, D V Szabó and R Würschum Charge compensation in trivalent cation doped bulk rutile TiO2Anna Iwaszuk and Michael Nolan Deep level transient spectroscopy studies of n-type ZnO single crystals grown by different techniquesL Scheffler, Vl Kolkovsky, E V Lavrov and J Weber Microstructural and conductivity changes induced by annealing of ZnO:B thin films deposited by chemical vapour depositionC David, T Girardeau, F Paumier, D Eyidi, B Lacroix, N Papathanasiou, B P Tinkham, P Guérin and M Marteau Multi-component transparent conducting oxides: progress in materials modellingAron Walsh, Juarez L F Da Silva and Su-Huai Wei Thickness dependence of the strain, band gap and transport properties of

  15. Electro-optic and magneto-dielectric properties of multifunctional nitride and oxide materials

    Science.gov (United States)

    Dixit, Ambesh

    Materials that simultaneously exhibit different physical properties provide a rich area of research leading to the development of new devices. For example, materials having a strong coupling between charge and spin degrees of freedom are essential to realizing a new class of devices referred to generally as spintronics. However, these multifunctional systems pose new scientific challenges in understanding the origin and mechanisms for cross-control of different functionalities. The core of this Ph.D. dissertation deals with multifunctional nitride and oxide compound semiconductors as well as multiferroic magnetic oxide systems by investigating structural, optical, electrical, magnetic, magnetodielectric and magnetoelectric properties. Thin films of InN nitride compound semiconductors and closely related alloys have been investigated to understand the effects of intrinsic defects on the materials properties while considering possible applications of highly degenerate InN thin films. As grown rf sputtered InN films on c-axis (0001) sapphire exhibit highly degenerate n-type behaviour due to oxygen defects introduced during growth. The effect of oxygen in InN matrix has been further investigated by intentionally adding oxygen into the films. These studies confirm that oxygen is one of the main sources of donor electrons in degenerate InN. Above some critical concentration of oxygen, secondary phases of In 2O3 and In-O-N complexes were formed. It was also possible to tune the carrier concentration to produce changes in the plasmon frequency, which varied from 0.45 eV to 0.8 eV. This characteristic energy scale suggests that these highly degenerate InN thin films could be used for thermophotovoltaic cells, optical filters, and other IR electro-optic applications. To probe the magnetism in transition metal doped InN system, In 0.98Cr0.02N and In0.95Cr0.05N thin films were fabricated. Our results suggest that these films develop ferromagnetic order above room temperature

  16. Economics of Food Irradiation; Aspects Economiques de l'Irradiation des Produits Alimentaires; Voprosy ehkonomichnosti obrabotki produktov pitaniya posredstvom oblucheniya; Aspectos Economicos de la Irradiacion de Alimentos

    Energy Technology Data Exchange (ETDEWEB)

    Rindorf, H. [A/S Radest, Herstedoester (Denmark)

    1966-11-15

    . El mejor medio para ello suele ser lanzar al mercado cierta cantidad de producto, a tftulo experimental, antes de decidir inversiones importantes en equipo muy especializado. Las instalaciones de investigacion o de produccion actualmente en funcionamiento han estudiado ya, con buenos resultados, el mercado de algunos productos y, segun anuncian, han procedido incluso a comercializarlos. En conclusion, son muchos los procesos de irradiacion de alimentos que parecen ofrecer perspectivas economicas favorables. (author) [Russian] V nastojashhee vremja imeetsja ochen' nadezhnoe oborudovanie dlja obluchenija, a dlja predprinimatelja glavnym javljaetsja soobrazhenie jekonomichnosti, kogda on reshaet vopros o primenenii priemlemoj dlja nego v drugih otnoshenijah obrabotki posredstvom obluchenija. V Danii odin promyshlennyj koncern nashel jekonomicheski opravdannym postroit' mnogocelevuju promyshlennuju ustanovku, oborudovannuju amerikanskim linejnym uskoritelem, i jeta ustanovka smozhet obrabatyvat' produkty pitanija. Do sih por nemnogo predprijatij v mire soobshhali o dejstvitel'nyh rashodah na promyshlennuju obrabotku produktov pitanija, odnako cifry rashodov iz drugih oblastej mogut sluzhit' v kachestve rukovodstva. Pri prakticheskih raschetah udobno razdeljat' rabotu na opredelennye tipichnye gruppy, naprimer, na ustanovki ''krupnye'', ''srednie'', ''tonkie'' i ''mnogocelevye'', odnako produkty pitanija mogut popadat' v ljuboj iz jetih razdelov. Stoimost' obluchenija zavisit ot svojstv produkta, vida ustanovki, godovyh i mesjachnyh kolichestv obrabatyvaemyh produktov, doz, kontrol'nyh norm, special'nyh trebovanij k pereupakovke i drugoj dopolnitel'noj obrabotke i t.d. Opredelennye cifry dlja konkretnogo sluchaja dolzhny osnovyvat'sja na tochnyh raschetah, odnako dlja predvaritel'nogo suzhdenija v rasporjazhenii predprinimatelja imeetsja mnogo obshhih ukazanij otnositel'no diapazona cen, i dlja mnogih celej uzhe ochevidno, chto obrabotka oblucheniem jekonomicheski

  17. The Combined Use of Autoradiographic and Electron Microscopic Techniques for Studies on Ultra-Thin Sections of Tritium-Labelled Cells of the Intestinal Epithelium; Emploi Combine de l'Autoradiographie et du Microscope Electronique pour L'Etude de Coupes Ultra-Fines de Cellules Tritiees de l'Epithelium Intestinal; 0421 043e 0432 043c 0435 0414 ; Empleo Combinado de Tecnicas de Autorradiografia y de MicroscopiA Electronica para Estudiar Cortes Ultrafinos de Celulas Tritiadas del Epitelio Intestinal

    Energy Technology Data Exchange (ETDEWEB)

    Hampton, J. C. [Division of Experimental Biology, Baylor University College of Medicine, TX (United States); Quastler, H. [Brookhaven National Laboratory, Upton, Long Island, NY (United States)

    1962-02-15

    tomado las micrografias electronicas adecuadas y aplicar una capa de emulsion suficientemente gruesa como para obtener una autorradiografia, pero, al mismo tiempo, bastante delgada como para permitir un nuevo examen de la muestra en el microscopio electronico y obtener micrografias electronicas de las autorradiografias de las celulas examinadas previamente. La emulsion autorradiografica se aplico en la siguiente forma: se formo primeramente una pelicula delgada sumergiendo un pequeno ojal de alambre en una emulsion liquida y trasladando la pelicula mediante el recurso de pasar el ojal sobre la muestra montado sobre un soporte, fijado a su vez en el extremo de una clavija de material plastico. El control adecuado se puede lograr tomando una seccion de media miera de espesor despues de cada operacion de corte, montandola sobre una placa de vidrio y aplicando luego las tecnicas autorradiograficas usuales. Debido a la fragilidad de los cortes ultrafinos, la proporcion de autorradiografias satisfactorias es bastante reducida. A pesar de este inconveniente, se espera que una vez perfeccionada la tecnica y adquirido experiencia en su manejo, este metodo permitira comprender mejor procesos que se verifican en las celulas vitales. (author) [Russian] Osvoennaja v nastojashhee vremja vozmozhnost' dostizhenija vysokoj razreshajushhej sposobnosti v izuchenii kletochnyh srezov pri pomoshhi jelektronnogo mikro- skopa otkryvaet puti k nabljudeniju za nekotorymi mezhkletochnymi javlenjami, vedushhimi k sintezu proteinov. Osobennosti pogloshhenija tritirovannogo timi- dina dezoksiribonukleinovoj kislotoj obrazujut sistemu, otkryvajushhuju vozmozhnost' tochnogo nabljudenija za vremenem ee proniknovenija i mestom ee sos- redotochenija v kletke. V dokladyvaemoj zdes' rabote pokazyvaetsja, chto sverh- tonkie srezy mechenyh kletochek mozhno izuchit' pri pomoshhi jelektronnogo mikroskopa, a zatem, posle poluchenija nuzhnoj mikrografii, vynut' obrazec, pokryt' ego plenkoj jemul'sii dostatochno

  18. High-Dose Ionizing Radiation Photographic Dosimetry; Mesure, par des Methodes Photogra Phiques, de Doses Elevees de Rayonnements Ionisants; 0424 041e 0422 041e 0413 0420 0414 ; Dosimetria Fotografica de Dosis Elevadas de Radiaciones Ionizantes

    Energy Technology Data Exchange (ETDEWEB)

    Trousil, J.; Bucina, I. [Institute for Research Production and Application of Radioisotopes Prague, Czechoslovakia (Czech Republic)

    1965-06-15

    potemnenija fotoplenki. Blagodarja tomu, chto ne byl ispol'zovan fotouvelichitel', minimal'no sokrashhena vozmozhnaja perederzhka pribora, chto udobno dlja obychnyh standartnyh izmerenij. Krome togo, privodjatsja parametry, kotorye dolzhny imet' dozimetricheskie plenki, chtoby byt' prigodnymi dlja obnaruzhenija bol'shih doz, a takzhe proizvoditsja sravnenie mezhdu kachestvom dozimetricheskih plenok FOMA i ORWO pri sluchajnom obluchenii. Dlja izmerenija doz bol'shoj moshhnosti uspeshno primenjalsja metod zatormozhennogo projavlenija, kotoryj opisyvaetsja v dal'nejshem i pri kotorom v projavitele byli ispol'zovany veshhestva tipa nitrobenzimida- zola i benztriazola v sootvetstvujushhih koncentracijah. V sluchae ispol'zovanija jemul'sii nebol'shoj chuvstvitel'nosti s bol'shim soderzhaniem serebra jetot metod pozvoljaet proizvodit' izmerenie doz gamma-izluchenija (rentgenovskogo izluchenija bolee vysokoj jenergii) vplot' do 10{sup 3} rad, a esli net neobhodimosti v opredelenii dozy - s tochnost'ju do 100 rad, to i vyshe. Pokazyvaetsja zatormazhivajushhee dejstvie himikaliev, dobavljaemyh v projavitel', na jemul'siju vysokoj i nizkoj chuvstvitel'nosti s bol'shim soderzhaniem serebra, kotorye ispol'zujutsja v dozimetrii. V jemul'sijah, kotorye ispol'zujutsja dlja izmerenija doz bol'shoj moshhnosti i kotorye projavljajut v projavitele s dobavleniem zatormazhivajushhih himikaliev, ustanovleno vlijanie zavisimosti ot jenergii i obescvechivanija skrytogo izobrazhenija na tochnost' izmerjaemyh doz. V zakljuchenie opisyvajutsja pogreshnosti fotograficheskoj dozimetrii bol'shih doz, kotorye obnaruzheny na osnove principa jeksperimental'nyh rabot posredstvom matematicheskoj statistiki. Uchityvaetsja uvelichenie pogreshnostej v diapazone neznachitel'nogo i bol'shogo potemnenija plenki. Uchityvajutsja takzhe pogreshnosti, obuslovlennye kalibrovkoj, zavisimost'ju ot jenergii, obescvechivaniem skrytogo izobrazhenija, himicheskoj obrabotkoj i izmereniem potemnenija. Ne uchityvaetsja pogreshnost

  19. Clinical Photoscintillography: Technique and Applications; Photoscintigraphie Clinique: Methode et Applications; Klinicheskaya fotostsintillografiya: metodika i primenenie; Fotocentelleografia Clinica: Tecnicas y Aplicaciones

    Energy Technology Data Exchange (ETDEWEB)

    Ephraim, K. H. [Rotterdamsch Radio-Therapeutisch Instituut, Rotterdam (Netherlands)

    1964-10-15

    stvitel'nosti plenki primenjaetsja umerennyj usilitel' k on tra stno sti , i plenka prosmatrivaetsja v televizionnoj si stem e s zakrytym konturom. Podcherkivaetsja neo b h o dimost' adaptirovanija kollimacii k reshaemoj klinicheskoj probleme. Obsuzhdajutsja rezul'taty primenenija v klinike vysheupomjanutoj metodiki dlja i zu ch e nija zabolevanij shhitovidnoj zhelezy, pochek, pecheni i skeleta . (author)

  20. Some Techniques for Isolating and Using Short-Lived Radioisotopes; Quelques Methodes d'Isolement et d'Utilisation des Radioisotopes a Courte Periode; НЕКОТОРЫЕ МЕТОДЫ ПОЛУЧЕНИЯ И ИСПОЛЬЗОВАНИЯ КОРОТКОЖИВУЩИХ ИЗОТОПОВ; Algunas Tecnicas de Aislamiento y Empleo de Radioisotopos de Periodo Corto

    Energy Technology Data Exchange (ETDEWEB)

    Nelson, F.; Kraus, K. A. [Chemstry Division, Oak Ridge National Laboratory, Oak Ridge, TN (United States)

    1963-03-15

    izotopov, poluchaemyh pri nejtronnom obluchenii materialov, v tom chisle rasshhepljajushhihsja jelementov. Poslednie, bezuslovno, javljajutsja nadezhnymi istochnikami rjada poleznyh ksrotko- zhivushhih izotopov, naprimer, Mo{sup 99} i Te{sup 132}. Opisyvajutsja yetody bystrogo vydelenija jetih izotopov s pomoshh'ju ionnogo obmena, a takzhe metody otdelenija korotkozhivushhih dochernih izotopov ot ishodnyh dolgozhivushhih izotopov s pomoshh'ju special'noj tehniki vydelenija (''doenija'') kogda ishodnyj izotop bystro adsorbiruetsja na organicheskih i neorganicheskih ionoobmennyh materialah. Obsuzhdajutsja takzhe tipichnye sluchai, naprimer, vydelenie In{sup 113} s periodom poluraspada 1,7 chasa (iz Sn{sup 113}) i Va{sup 137} s periodom poluraspada 2,6 min (iz Sv{sup 137}). Opisyvajutsja dva vida primenenija korotkozhivushhih indikatorov v himicheskih issledovanijah. Vo- pervyh, metod 'uplotnennogo sloja' dlja bystrogo izmerenija rastvorimosti umerenno rastvorimyh solej, mechennyh indikatorami. Privodjatsja nekotorye novye dannye, poluchennye s pomoshh'ju jetogo metoda, v otnoshenii rastvorimosti LaF{sub 3} v rastvorah HCl i HClO{sub 4}. Vo-vtoryh, opisan bystryj metod izmerenija kojefficientov diffuzii v zhidkih sistemah. Tonkie poristye farforovye fritty nasyshhajutsja rastvorom, soderzhashhim radioizotop, zatem bystro promyvajutsja rastvorom, ne soderzhashhim indikatory. Kojefficienty diffuzii mogut byt' rasschitany iz umen'shenija skorosti scheta fritta s techeniem vremeni posle sravnenija s materialom s izvestnoj skorost'ju diffuzii. Blagodarja korotkomu sroku diffuzii, s pomoshh'ju jetogo metoda izmerenija mogut byt' provedeny za znachitel'no bolee korotkoe vremja, chem s pomoshh'ju obychnyh metodik, naprimer, s pomoshh'ju kamery s diafragmoj ili kapilljarnyh trubok. (author)

  1. Use of the Neutron Die-Away Technique to Test Control Rod Effectiveness Theories; Emploi de la Methode d'Absorption des Neutrons pour Verifier les Theories sur l'Efficacite des Barres de Commande; Ispol'zovanie metoda spada potoka nejtronov dlya proverki teorij ehffektivnosti reguliruyushchikh sterzhnej; Aplicacion de la Tecnica de Extincion Neutronica a la Verificacion de las Teorias sobre la Eficacia de las Barras de Control

    Energy Technology Data Exchange (ETDEWEB)

    Perez, R. B. [University of Florida, Gainesville, FL (United States); De Saussure, G.; Silver, E. G. [University of Florida, Gainesville, FL (United States); Oak Ridge National Laboratory, Oak Ridge, TN (United States)

    1964-04-15

    actualmente determinaciones con barras de dimensiones intermedias, a fin de averiguar el limite de aplicacion de la teoria de la difusion. (author) [Russian] Raschety jeffektivnosti regulirujushhih sterzhnej uslozhnjajutsja ih zavisimost'ju kak ot raspredelenija jenergij nejtronov, tak m ot geometrii sborki. Pri sravnenii teoreticheskih dannyh s rezul'tatami jeksperimentov, provedennyh na reaktorah ili kriticheskih sistemah, voznikajut trudnosti, svjazannye s vnutrennej slozhnost'ju takih sistem. Metod spada potoka nejtronov pozvoljaet poluchit' model' vseh teplovyh nejtronov, v kotoroj raspredelenie jenergii nejtronov mozhet byt' otdeleno ot prostranstvennyh jeffektov. Pojetomu geometricheskij faktor jeffektivnosti regulirujushhego sterzhnja mozhet byt' izuchen bez ucheta detalej nejtronnogo spektra, a rezul'taty mogut byt' sravneny s rezul'tatami chistoj prostoj jeksperimental'noj ustanovki. Metod osnovan na tom fakte, chto v jeksperimente s zamiraniem nejtronov, kak on zdes' opisan, laplasian sborki svjazan s postojannoj raspada osnovnogo vida po formuljo: B{sup 2} = ({lambda} - {lambda}{sub a})/D {lambda}{sub a} gde Ha-obratnyj poluperiod nejtronov v zamedlitele (sek-1 ); D- postojannaja diffuzii (sm2 'sek-1 ). V zamedljajushhih sborkah, ispol'zuemyh dlja jetih jeksperimentov, imelis' prjamougol'nye berillievye prizmy razlichnyh razmerov, sostavlennye iz nebol'shih (7,3 h 7,3 h 5,24 sm) blokov. Ispol'zovalis' tri vida kadmievyh regulirujushhih sterzhnej: tonkie diametrom 0,476sm, krestoobraznye i polye ''tolstye'' sterzhni secheniem 7,3 X 7,3sm. Byli provereny sledujushhie teoreticheskie shemy: 1) Nordhejma -Skalettara; 2) Hurvitca-Roe; 3) Cifrovoj hod diffuzii. Jeffekt krestoobraznogo poglotitelja byl raschitan s pomoshh'ju metoda konformnogo preobrazovanija Hurvitca-Roe. Dlja laplasiana bylo polucheno znachenie 0,0188sm{sup -2}, chto sravnimo s jeksperimental'nymi rezul'tatami, sostavivshimi 0,0187 {+-} 0,0006 cm{sup -2}. Znachenija, poluchennye dlja tolstyh sterzhnej s

  2. Electron-Exchange Reactions of Aromatic Molecules; Echanges d'Electrons de Molecules Aromatiques; Reaktsii ehlektronnogo obmena aromaticheskikh molekul; Reacciones de Intercambio Electronico en Moleculas Aromaticas

    Energy Technology Data Exchange (ETDEWEB)

    Malachesky, P. A.; Miller, T. A.; Layloff, T.; Adams, R. N. [University of Kansas, Lawrence, KS (United States)

    1965-10-15

    'shoe kolichestvo informacii otnositel'no skorosti mehanizma processov neorganicheskogo obmena jelektronov. V protivopolozhnost' jetomu chisto organicheskim sistemam udeljalos' dovol'no neznachitel'noe vnimanie. Skorost' gomogennogo jelektronnogo obmena (k{sub 0bm})i geterogennye konstanty skorosti dlja jelektrodnoj reakcii (k{sub jel}) byli izmereny lish' dlja neskol'kih ugle- vodorodov . Bylo izmereno k{sub 0bm} dlja razlichnyh aromaticheskih sistem, v tom chisle uglevodorodov, hinonov i nitrosoedinenij. Jeti izmerenija byli provedeny posredstvom jelektronnogo para- magnitnogo rezonansa (EPR) s perenosom izmerenij na smesi radikal'nyh ionov i ih mate- rinskih soedinenij. Nam takzhe udalos' izmerit' k0bm s takoj tochnost'ju, kotoraja pozvo- ljaet obnaruzhit' nebol'shie razlichija, vyzvannye, verojatno; molekuljarnoj strukturoj i sre- doj. Uglevodorodnye sistemy, podobnye antracenovomu/antracenovomu anionu, javljajutsja ves'ma bystrymi pri velichine k{sub 0gM} priblizitel'no 10{sup 8}-10{sup 9} litr mol{sup -i} sek{sup -1}. Nekotorye zame- shhennye aromaticheskie soedinenija, podobnye hinonam i nitrilam, takzhe javljajutsja ves'ma bystrymi. Odnako, kogda imeetsja sil'naja funkcija jelektronnogo akceptora, podobno nitro- gruppe v nitrobenzole, velichina k{sub 0gM} sokrashhaetsja na faktor 10. Predstavljaetsja vozmozhnym korrelirovat' izmenenija v k{sub obm} v serijah nitrobenzola s pomoshh'ju plotnosti neparnyh jelek- tronov po konstantam svjazi N{sup 14} spektra EPR. Krome togo, nitroaromaticheskie serii obna- ruzhivajut ochen' bol'shie razlichija v znachenijah k{sub 0b} m s rastvorjajushhej sistemoj. Jeti izmene- nija mozhno korrelirovat' blagodarja nedavnim issledovanijam jeffekta sol'vatacii na sverh- tonkie konstanty svjazi. V poslednee vremja Markus rassmotrel teoriju himicheskogo i jelektrohimicheskogo pere- nosa jelektronov i predlozhil korreljacii mezhdu znachenijami k{sub obm} i k{sub jel}. Nami special'no byl izmeren kjel dlja sistemy nitrobenzola v uslovijah, kotorye

  3. The Role of Non-Destructive Testing in Test-Reactor Operation at the National Reactor Testing Station; Role des Essais Non Destructifs dans l'Exploitation des Reacteurs d'Essai au Centre National d'Essais de Reacteurs; Rol' nedestruktivnykh ispytanij pri ehkspluatatsii ispytatel'nykh reaktorov na natsional'noj stantsii po ispytaniyam reaktorov; Papel de los Metodos No Destructivos en la Explotacion de los Reactores de la National Reactor Testing Station

    Energy Technology Data Exchange (ETDEWEB)

    Francis, W. C.; Brown, E. S.; Burdick, E. E.; Gibson, G. W.; Tingey, F. H. [Phillips Petroleum Company, Atomic Energy Division, Idaho Falls, Idaho (United States)

    1965-10-15

    finansovyh zatrat na material, chisljashhijsja vne specifikacii. Rentgenovskie snimki toplivnyh plasti- nok dajut razmery aktivnyh zon i s pomoshh'ju razvertki densitometra opredeljajut rasprede- lenie topliva. Rentgenovskaja s{sup e}mka svarnyh shvov javljaetsja standartnoj proceduroj dlja reaktorov i komponentov opytnyh petel'. Vygoranie topliva i otravlenie v opytnyh obrazcah mozhet byt' opredeleno v kazhdom cikle reaktora putem ispol'zovanija usovershenstvovannogo ustrojstva po izmereniju reak- tivnosti (ARMF). V kakoj-to stepeni neobychnoe primenenie dlja kriticheskogo ustrojst- va javljaetsja izmerenie soderzhanija bora v toplive na kriticheskoj ustanovke po tehnologii ispytatel'nyh reaktorov (ETNS). Toki Fuko i mehanicheskoe zondirovanie rasstojanija toplivnyh plastinok i izmerenie tolshhiny okisi plenki (korrozija) s pomoshh'ju tokov Fuko obluchennyh plastinok dali otlich- nye rezul'taty. Dopolnitel'nye sposoby, kotorye okazalis' ves'ma cennymi, vkljuchajut obsledovanie zhidkih proniknovenij i opyty po zhidkomu azotu dlja treshhin na poverhnostjah, opyty po teplovomu otzhigu dlja okalin i g a m m a - skennirovanie obluchennyh plastin. Gid- ravlicheskoe ispytanie stabil'nyh obrazcov toplivnyh jelementov ispol'zuetsja dlja t o g o , chtoby podtverdit' strukturnuju celostnost', v osobennosti, silu soedinenija.toplivnyh plastinok. Vedutsja dal'nejshie raboty po uluchsheniju sushhestvujushhih metodov i po razrabotke novyh nedestruktivnyh metodov obsledovanija. (author)

  4. New Frontiers for Non-Destructive Testing in the Nuclear Age; Perspectives des Essais Non Destructifs a l'Ere Nucleaire; ''Novye rubezhi'' nedestruktivnykh ispytanij v yadernyj vek; Nuevas Posibilidades de los Ensayos No Destructivos en la Era Nuclear

    Energy Technology Data Exchange (ETDEWEB)

    Ballard, D. W. [Sandia Laboratory Albuquerque, NM (United States)

    1965-10-15

    {sup -12}sm{sup 3}/sek, ili 1'sm{sup 3} v techenie 500 let. Drugim cennym metodom javljaetsja radiografija v dvizhenii pri bol'shih uvelichenijah s ispol'zovaniem vidikonov, chuvstvitel'nyh k rentgenovskim lucham. Osveshhaetsja novyj analogichnyj metod (kinosonografija), pri kotorom ispol'zuetsja ne radiografija, a ul'tra- zvukovoe izobrazhenie. V zakljuchenie raboty rassmatrivaetsja novyj vid polnost'ju avtoma- ticheskogo bystrodejstvujushhego oborudovanija, razra''atyvaemogo dlja ispol'zovanija pri byst- rom skennirovanii. Takie sistemy budut vkljuchat' neskol'ko metodov nedestruktivnyh ispyta- nij, kotorye primenjajutsja odnovremenno. Pribory ispol'zujushhie infrakrasnye luchi, jelektro- magnitnye kolebanija i toki vysokoj chastoty v sochetanii s o skennirujushhimi ustrojstvami, upravljaemye s pomoshh'ju magnitnoj plenki, sootvetstvujushhim obrazom prispasablivajutsja dlja poluchenija vyhodnyh izobrazhenij, kotorye prigodny dlja distancionnogo televizionnogo vospro- izvedenija i zapisi. Rassmotreny ispytatel'nye parametry, vosproizvodjashhie sposobnosti i ne- preryvnye sistemy kontrolja. Jeti vozmozhnosti uzhe vyjavleny v hode laboratornyh ispyta- nij i ih sleduet takzhe ispol'zovat' i pri zavodskih ispytanijah, esli my hotim dobit'sja bol'shej nadezhnosti oborudovanija v jadernoj promyshlennosti. (author)

  5. Analyser for fast single events; Analyseur d'evenements rapides simples; Analizator bystrykh odnokratnykh yavlenij; Analizador de sucesos rapidos no recurrentes

    Energy Technology Data Exchange (ETDEWEB)

    Sedlmeyer, J W; Patten, R B; Fussell, L Jr [Edgerton, Germeshausen And Grier, Inc., Las Vegas, NV (United States)

    1962-04-15

    otrezki dostigaetsya pri pomoshchi vremennogo selektornogo impul'sa i intervala vremeni mezhdu otborom obraztsov, prichem i tot i drugoj mogut regulirovat'sya nezavisimo drug ot druga, nachinaya priblizitel'no s 4 nanosekund. Intervaly vremeni mogut zadavat'sya v nelinejnom poryadke, a razbros mezhdu nimi ne prevyshaet 0,5 nanosekund. Do nastoyashchego vremeni skorost' otvetnoj reaktsii ogranichivaetsya kharakteristikami dioda. Kazhdoe otobrannoe napryazhenie rasshiryaetsya v konture, kotoryj sokhranyaet amplitudu ehtogo napryazheniya. Udalos' osushchestvit' rasshirenie po vremeni v 10{sup 8} raz s sokhraneniem khoroshej ustojchivosti. Tochki pokazanij mogut soobshchat'sya i peredavat'sya po otkrytomu provodu v nizkochastotnoe registriruyushchee ustrojstvo, oni mogut byt' prevrashcheny v tsifrovye dannye dlya bystroj ikh obrabotki s pomoshch'yu obychnogo oborudovaniya; krome togo, ili vmesto ehtogo, oni mogut byt' dany vizual'no. Analizator imeet preimushchestva po sravneniyu s vysokoskorostnoj ostsiloskopiej, kogda trebuetsya provodit' individual'nyj analiz bol'shogo chisla odnokratnykh perekhodyashchikh signalov; ehto trebuetsya pri izuchenii kolebanij otvetnykh reaktsij sistem ili pri proizvodstvennykh ispytaniyakh komponentov. Analizator imeet preimushchestva, kogda analiz dannykh dolzhen proizvodit'sya neposredstvenno za poyavleniem signala; otpadaet neobkhodimost' proyavlyat' plenki ili prochityvat' ikh. Analizator udoben takzhe v tekh sluchayakh, kogda schetno-analiziruyushchij tsentr raspolozhen daleko ot mesta poyavleniya signala. EHtot metod shiroko primenyaetsya v oblasti yadernoj ehnergii. Metod pul'siruyushchikh nejtronov mozhet byt' primenen dlya bystrogo izucheniya kolebanij rezhima reaktorov i podkriticheskikh sborok. Mogut byt' opredeleny parametry nakopleniya i raspada detektorov i odnovremenno provodit'sya analiz statisticheskikh dannykh i kolebanij. Mozhet izmeryat'sya forma impul'sov radiatsionnykh voln, proizvodimykh yadernymi uskoritelyami. S

  6. Radioautography in the Study of Radioisotopically-Tagged Substances in Insect Control; L'autoradiographie dans l'etude de substances marquees au moy en de radioisotopes utilisees dans la lutte contre les insectes; Primenenie radioavtografii pri izuchenii substantsij, mechennykh radioizotopami, v bor'be s nasekomymi; La autorradiografia en el estudio de las sustancias marcadas con radioisotopos utilizadas en la lucha contra los insectos

    Energy Technology Data Exchange (ETDEWEB)

    Joftes, D. L. [New England Deaconess Hospital, Boston, MA (United States)

    1963-09-15

    ''4 (kotorye zhelatel'ny, poskol'ku pochti kazhdyj insektitsid budet soderzhat' uglerod i vodorod) imeyut to preimushchestvo, chto dayut radioavtogrammy s vysokoj razreshayushchej sposobnost'yu i imeyut bol'shoj period poluraspada i poehtomu ne voznikaet trudnostej v tekh sluchayakh, kogda neobkhodim ochen' dlitel'nyj srok ehkspozitsii. Prodolzhitel'naya ehkspozitsiya mozhet potrebovat'sya, kogda predpolagaetsya nalichie ochen' nebol'shikh kolichestv radioaktivnykh veshchestv dazhe pri vysokoj udel'noj aktivnosti insektitsida. Neobkhodimo byt' uverennym v tom, chto insektitsid popadaet v tu chast' molekuly, gde radioaktivnyj indikator ostaetsya svyazannym s toj polovinoj, kotoruyu zhelatel'no izuchit'. Posle togo kak insektitsid pogloshchen ili vveden, podgotovka preparata osushchestvlyaetsya obychnymi gistologicheskimi metodami fiksatsii, zalivki, prigotovleniya srezov i nalozheniya na predmetnoe steklo. Zatem tkani mogut byt' deparafinirovany i gidratirovany, posle chego oni gotovy dlya pokrytiya yadernoj fotoehmul'siej. Esli radioaktivnye,sostavlyayushchie v tkanyakh nakhodyatsya v rastvorimom sostoyanii, to dlya izbezhaniya poteri ili mobilizatsii radioizotopa mogut byt' primeneny metody sushki zamorazhivaniem. Dlya takikh preparatov mozhno primenyat' sukhie ehmul'sionnye plenki. Okraska mozhet proizvodit'sya kak do, tak i posle primeneniya yadernoj fotoehmul'sii, v zavisimosti ot kharaktera trebuyushchejsya okraski. V obshchem, predpochtitel'nee okrashivat' posle togo, kak fotoehmul'siya nanesena i proyavlena. Pri primenenii izotopov s dostatochnoj ehnergiej izlucheniya radioaatografirovaniyu mogut podvergnut'sya rasteniya ili ikh chasti tselikom, i v ehtom sluchae gistologicheskaya obrabotka mozhet byt' isklyuchena; ta chast', kotoraya dolzhna podvergnut'sya radioavtografii, prizhimaetsya k plenke v presse dlya rastitel'nykh obraztsov ili v drugom, prigodnom dlya ehtogo ustrojstve. Naibolee udobnym metodom primeneniya yadernykh fotoehmul'sij dlya gistolicheskikh

  7. Solid State Ionics Advanced Materials for Emerging Technologies

    Science.gov (United States)

    Chowdari, B. V. R.; Careem, M. A.; Dissanayake, M. A. K. L.; Rajapakse, R. M. G.; Seneviratne, V. A.

    2006-06-01

    . Invited papers. Cathodic properties of Al-doped LiCoO[symbol] prepared by molten salt method Li-Ion batteries / M. V. Reddy, G. V. Subba Rao, B. V. R. Chowdari. Layered ion-electron conducting materials / M. A. Santa Ana, E. Benavente, G. González. LiNi[symbol]Co[symbol]O[symbol] cathode thin-film prepared by RF sputtering for all-solid-state rechargeable microbatteries / X. J. Zhu ... [et al.] -- Contributed papers. Contributed papers. Nanocomposite cathode for SOFCs prepared by electrostatic spray deposition / A. Princivalle, E. Djurado. Effect of the addition of nanoporous carbon black on the cycling characteristics of Li[symbol]Co[symbol](MoO[symbol])[symbol] for lithium batteries / K. M. Begam, S. R. S. Prabaharan. Protonic conduction in TiP[symbol]O[symbol] / V. Nalini, T. Norby, A. M. Anuradha. Preparation and electrochemical LiMn[symbol]O[symbol] thin film by a solution deposition method / X. Y. Gan ... [et al.]. Synthesis and characterization LiMPO[symbol] (M = Ni, Co) / T. Savitha, S. Selvasekarapandian, C. S. Ramya. Synthesis and electrical characterization of LiCoO[symbol] LiFeO[symbol] and NiO compositions / A. Wijayasinghe, B. Bergman. Natural Sri Lanka graphite as conducting enhancer in manganese dioxide (Emd type) cathode of alkaline batteries / N. W. B. Balasooriya ... [et al.]. Electrochemical properties of LiNi[symbol]Al[symbol]Zn[symbol]O[symbol] cathode material synthesized by emulsion method / B.-H. Kim ... [et al.]. LiNi[symbol]Co[symbol]O[symbol] cathode materials synthesized by particulate sol-gel method for lithium ion batteries / X. J. Zhu ... [et al.]. Pulsed laser deposition of highly oriented LiCoO[symbol] and LiMn[symbol]O[symbol] thin films for microbattery applications / O. M. Hussain ... [et al.]. Preparation of LiNi[symbol]Co[symbol]O[symbol] thin films by a sol-gel method / X. J. Zhu ... [et al.]. Electrochemical lithium insertion into a manganese dioxide electrode in aqueous solutions / M. Minakshi ... [et al.]. AC impedance

  8. Reactions of Hot Hydrogen Atoms with Ethylene. The Role of Excited Ethyl Radicals as Intermediate Products; Reactions des Atomes Chauds d'Hydrogene avec l'Ethylene. Le Role des Radicaux Ethyle Excites Comme Produits Intermediaires; Reaktsiya goryachikh atomov vodoroda s ehtilenom. Rol' vozbuzhdennykh ehtil'nykh radikalov kak promezhutochnykh produktov; Reacciones de Atomos Calientes de Hidrogeno con Etileno Papel de los Radicales Etilicos Excitados como Productos Intermedios

    Energy Technology Data Exchange (ETDEWEB)

    Dzantiev, B. G.; Shvedchikov, A. P. [Institut Himicheskoj Fiziki AN SSSR, SSSR (Russian Federation)

    1965-04-15

    temperatura sobre el rendimiento de C{sub 2}H{sub 6} y C{sub 4}H{sub 10} por radiolisis del C{sub 2}H{sub 4} y fotolisis de mezclas de C{sub 2}H{sub 4} -HI, los autores establecen una hipotesis sobre la formacion de radicales etilicos excitados (C{sub 2}H*{sub 5}). Estos ultimos se obtienen como resultado de la combinacion de atomos de hidrogeno calientes generados por radiolisis o por fotolisis, con el etileno: J* + C{sub 2}H{sub 4} = C{sub 2}H*{sub 5}. Demuestran que el radical C2Hf interviene facilmente en la reaccion C{sub 2}H*{sub 5} + RH = C{sub 2}H{sub 6} + R, que explica el 'exceso' de etano formado durante la radiolisis del etileno. (author) [Russian] Izvestno, chto v rezul'tate jadernyh reakcij Li{sup 6}(n, {alpha})T i He{sup 3}(n, p) T obrazujutsja gorjachie atomy radioaktivnogo vodoroda. Vysokaja himicheskaja aktivnost' takih atomov vo mnogom opredeljaet osobennosti himicheskih posledstvij jadernyh prevrashhenij. Odnako gorjachie atomy vodoroda mogut igrat' sushhestvennuju rol' ne tol'ko v jadernoj himii, no i v drugih oblastjah himii vysokih jenergij: pri radiolize, fotolize i t.d. V nastojashhej rabote sdelana popytka sopostavit' povedenie gorjachih atomov vodoroda, poluchaemyh razlichnym putem: pri reakcii i{sup 6}(n, {alpha})T (E{sub otd} = 2,7 Mjev), radioliticheski (E Tilde-Operator neskol'koojev), fotoliticheski (E Tilde-Operator 1 - 1,5 jev; gorjachij vodorod poluchaetsja iz HJ pri fotolize s {lambda}2537A). V kachestve mishenej dlja poluchenija atomov tritija ispol'zovalis' kristally i plenki Li{sub 2}Co{sub 3}, Li{sup 6}F, Li{sup 6}OH, Li{sup 6}BO{sub 2} * 8H{sub 2}. Oblucheniju podvergali gazoobraznyj jetilen (R = 5-10 atm.) i ego smesi s ammiakom, geliem i ingibitorami. Obluchenie provodilos' na rjoaktore tipa IRT-1000 pri potoke teplovyh nejtronov 10{sup 11} - 10{sup 12} n/cm{sup 2}sek. Mechennye po tritiju soedinenija i produkty radiacionno-himicheskih reakcij opredeljali gazohromatograficheski s pomoshh'ju dvuh posledovatel'no soedinennyh