WorldWideScience

Sample records for rf plasma chemical

  1. RF-plasma vapor deposition of siloxane on paper. Part 2: Chemical evolution of paper surface

    International Nuclear Information System (INIS)

    Sahin, Halil Turgut

    2013-01-01

    Highlights: ► Investigate the detailed RF-cold plasma surface modified paper by XPS and ATR-FTIR. ► Some chemical analysis of RF-cold plasma surface modified paper after RF plasma treatment. ► Identify the connection between RF plasma treatment and the surface chemistry of paper surface. - Abstract: Survey and high-resolution (HR) XPS studies indicate that OMCTSO plasma treatment created a new silicon containing functional groups and changed the hydroxyl content on the surface of paper. Four intense survey XPS spectrum peaks were observed for the OMCTSO plasma treated paper. They were the Si 2p at 100 eV, Si 2s at 160 eV, C 1s at 285 eV, and O 1s at 525 eV for the plasma modified surface. It was realized that the macromolecular chain-breaking mechanisms and plasma-induced etching processes control the number and the availability of OH-functionalities during OMCTSO plasma exposure on paper. The reaction, initiated by these species, depends mainly on the nature of chemicals in the plasma as well as on the energy level of the plasma and the nature of the surface effects in the modification of the paper. The ATR-FTIR spectrum of paper treated with OMCTSO plasma has characteristic absorption bands attributed to the Si-O and Si-O-Si formations on the surface.

  2. Chemical compositions of spherical titanium powders prepared by RF induction plasma

    International Nuclear Information System (INIS)

    Gu Zhongtao; Jin Yuping; Ye Gaoying

    2012-01-01

    Spherical titanium powders were prepared by RF induction plasma technology. The particle size is essentially un- changed, while the particle size distribution is relatively narrow after spheroidization processing. X-ray diffraction (XRD) random testing of the spherical titanium powders shows no structure and phase changes. The content of O, H, N and C decreases, while the content of Ti increases slightly. It indicates that spheroidization with RF plasma can enhance powder purity. (authors)

  3. Comparative studies of chemically synthesized and RF plasma ...

    Indian Academy of Sciences (India)

    journal of. April 2015 physics pp. 653–665. Comparative studies of ... MS received 16 April 2013; revised 5 February 2014; accepted 28 May 2014 ... RF plasma polymerization; poly(o-toluidine); Fourier transform infrared; UV–visible ... tial applications, e.g., as electrodes and membranes for electrochemical energy ...

  4. Theoretical characterization of electron energy distribution function in RF plasmas

    International Nuclear Information System (INIS)

    Capitelli, M.; Capriati, G.; Dilonardo, M.; Gorse, C.; Longo, S.

    1993-01-01

    Different methods for the modeling of low-temperature plasmas of both technological and fundamental interest are discussed. The main concept of all these models is the electron energy distribution function (eedf) which is necessary to calculate the rate coefficients for any chemical reaction involving electrons. Results of eedf calculations in homogeneous SF 6 and SiH 4 plasmas are discussed based on solution of the time-dependent Boltzmann equation. The space-dependent eedf in an RF discharge in He is calculated taking into account the sheath oscillations by a Monte Carlo model assuming the plasma heating mechanism and the electric field determined by using a fluid model. The need to take into account the ambipolar diffusion of electrons in RF discharge modeling is stressed. A self-consistent model based on coupling the equations of the fluid model and the chemical kinetics ones is presented. (orig.)

  5. Influence of the RF electrode cleanliness on plasma characteristics and dust-particle generation in methane dusty plasmas

    Science.gov (United States)

    Géraud-Grenier, I.; Desdions, W.; Faubert, F.; Mikikian, M.; Massereau-Guilbaud, V.

    2018-01-01

    The methane decomposition in a planar RF discharge (13.56 MHz) leads both to a dust-particle generation in the plasma bulk and to a coating growth on the electrodes. Growing dust-particles fall onto the grounded electrode when they are too heavy. Thus, at the end of the experiment, the grounded electrode is covered by a coating and by fallen dust-particles. During the dust-particle growth, the negative DC self-bias voltage (VDC) increases because fewer electrons reach the RF electrode, leading to a more resistive plasma and to changes in the plasma chemical composition. In this paper, the cleanliness influence of the RF electrode on the dust-particle growth, on the plasma characteristics and composition is investigated. A cleanliness electrode is an electrode without coating and dust-particles on its surface at the beginning of the experiment.

  6. Concept Study of Radio Frequency (RF Plasma Thruster for Space Propulsion

    Directory of Open Access Journals (Sweden)

    Anna-Maria Theodora ANDREESCU

    2016-12-01

    Full Text Available Electric thrusters are capable of accelerating ions to speeds that are impossible to reach using chemical reaction. Recent advances in plasma-based concepts have led to the identification of electromagnetic (RF generation and acceleration systems as able to provide not only continuous thrust, but also highly controllable and wide-range exhaust velocities. For Future Space Propulsion there is a pressing need for low pressure, high mass flow rate and controlled ion energies. This paper explores the potential of using RF heated plasmas for space propulsion in order to mitigate the electric propulsion problems caused by erosion and gain flexibility in plasma manipulation. The main key components of RF thruster architecture are: a feeding system able to provide the required neutral gas flow, plasma source chamber, antenna/electrodes wrapped around the discharge tube and optimized electromagnetic field coils for plasma confinement. A preliminary analysis of system performance (thrust, specific impulse, efficiency is performed along with future plans of Space Propulsion based on this new concept of plasma mechanism.

  7. Characterization of Carbon-Contaminated B4C-Coated Optics after Chemically Selective Cleaning with Low-Pressure RF Plasma.

    Science.gov (United States)

    Moreno Fernández, H; Rogler, D; Sauthier, G; Thomasset, M; Dietsch, R; Carlino, V; Pellegrin, E

    2018-01-22

    Boron carbide (B 4 C) is one of the few materials that is expected to be most resilient with respect to the extremely high brilliance of the photon beam generated by free electron lasers (FELs) and is thus of considerable interest for optical applications in this field. However, as in the case of many other optics operated at light source facilities, B 4 C-coated optics are subject to ubiquitous carbon contaminations. Carbon contaminations represent a serious issue for the operation of FEL beamlines due to severe reduction of photon flux, beam coherence, creation of destructive interference, and scattering losses. A variety of B 4 C cleaning technologies were developed at different laboratories with varying success. We present a study regarding the low-pressure RF plasma cleaning of carbon contaminated B 4 C test samples via inductively coupled O 2 /Ar, H 2 /Ar, and pure O 2 RF plasma produced following previous studies using the same ibss GV10x downstream plasma source. Results regarding the chemistry, morphology as well as other aspects of the B 4 C optical coating before and after the plasma cleaning are reported. We conclude that among the above plasma processes only plasma based on pure O 2 feedstock gas exhibits the required chemical selectivity for maintaining the integrity of the B 4 C optical coatings.

  8. Vortex formation during rf heating of plasma

    International Nuclear Information System (INIS)

    Motley, R.W.

    1980-05-01

    Experiments on a test plasma show that the linear theory of waveguide coupling to slow plasma waves begins to break down if the rf power flux exceeds approx. 30 W/cm 2 . Probe measurements reveal that within 30 μs an undulation appears in the surface plasma near the mouth of the twin waveguide. This surface readjustment is part of a vortex, or off-center convective cell, driven by asymmetric rf heating of the plasma column

  9. Characteristic performance of radio-frequency(RF) plasma heating using inverter RF power supplies

    International Nuclear Information System (INIS)

    Imai, Takahiro; Uesugi, Yoshihiko; Takamura, Shuichi; Sawada, Hiroyuki; Hattori, Norifumi

    2000-01-01

    High heat flux plasma are produced by high powe (∼14 kW) ICRF heating using inverter power supplies in the linear divertor simulator NAGDIS-II. The power flow of radiated rf power is investigated by a calorimetric method. Conventional power calculation using antenna voltage and current gives that about 70% of the rf power is radiated into the plasma. But increase of the heat load at the target and anode is about 10% of the rf power. Through this experiment, we find that about half of the rf power is lost at the antenna surface through the formation of rf induced sheath. And about 30% of the power is lost into the vacuum vessel through the charge exchange and elastic collision of ions with neutrals. (author)

  10. RF and microwave diagnostics of plasma

    International Nuclear Information System (INIS)

    Basu, J.

    1976-01-01

    A brief review of RF and microwave investigations carried out at laboratory plasma is presented. Both the immersive and non-immersive RF probes of various types are discussed, the major emphasis being laid on the work carried out in extending the scope of the immersive impedance probe and non-immersive coil probe. The standard microwave methods for plasma diagnosis are mentioned. The role of relatively new diagnostic tool, viz., a dielectric-rod waveguide, is described, and the technique of measuring the admittance of such a waveguide (or an antenna) enveloped in plasma is discussed. (K.B.)

  11. RF Electron Gun with Driven Plasma Cathode

    CERN Document Server

    Khodak, Igor

    2005-01-01

    It's known that RF guns with plasma cathodes based on solid-state dielectrics are able to generate an intense electron beam. In this paper we describe results of experimental investigation of the single cavity S-band RF gun with driven plasma cathode. The experimental sample of the cathode based on ferroelectric ceramics has been designed. Special design of the cathode permits to separate spatially processes of plasma development and electron acceleration. It has been obtained at RF gun output electron beam with particle energy ~500 keV, pulse current of 4 A and pulse duration of 80 ns. Results of experimental study of beam parameters are referred in. The gun is purposed to be applied as the intense electron beam source for electron linacs.

  12. Analytic analysis on asymmetrical micro arcing in high plasma potential RF plasma systems

    International Nuclear Information System (INIS)

    Yin, Y; McKenzie, D R; Bilek, M M M

    2006-01-01

    We report experimental and analytical results on asymmetrical micro arcing in a RF (radio frequency) plasma. Micro arcing, resulting from high plasma potential, in RF plasma was found to occur only on the grounded electrode for a variety of electrode and surface configurations. The analytic derivation was based on a simple RF time-dependent Child-Langmuir sheath model and electric current continuity. We found that the minimum potential difference in one RF period across the grounded electrode sheath depends on the area ratio of the grounded electrode to the powered electrode. As the area ratio increases, the minimum potential difference across a sheath increases for the grounded electrode but not for the RF powered electrode. We showed that discharge time in micro arcing is more than 100 RF periods; thus the presence of a continuous high electric field in one RF cycle results in micro arcing on the grounded electrode. However, the minimum potential difference in one RF period across the powered electrode sheath is always small so that it prevents micro arcing occurring even though the average sheath voltage can be large. This simple analytic model is consistent with particle-in-cell simulation results

  13. Investigation of Inonotus obliquus (Pers. Pil. Extracts and Melanins after RF-plasma Treatment of Raw Material

    Directory of Open Access Journals (Sweden)

    O.Yu. Kuznetsova

    2016-03-01

    Full Text Available High-frequency capacitive discharge (RF plasma at low pressure was used as preliminary stage for the intensification of extraction from natural medicinal raw material. RF-plasma treatment was carried out in two modes differed by the nature of plasma-forming gas. Chaga (Inonotus obliquus (Pers. Pil. known as the birch mushroom was selected as a perspective source of raw material. Extraction was carried out in two ways – remaceration and maceration. The analy-sis of chaga extracts and melanins was performed using traditional techniques including determination of physical and chemical, antioxidant and spectral characteristics. The obtained extracts and melanins were compared to the control samples and literature data. RF-plasma treatment of medicinal raw material increased the yield of extractive substances, in particular of the main active component of chaga – melanin. The antioxidant activity of chaga extracts grew, while for melanins it remained at the level similar to that of control samples. The IR spectral characteristics of the studied chaga melanins are similar and agree well with the literature data. Insignificant deviations in the position and intensity of absorption strips were observed for the samples after RF treatment. IR spectra of the studied chaga melanins are similar to those for mushroom melanins, thereby confirming the similarity in their nature. RF-plasma treatment of chaga medicinal raw materials allows to modify them partially. The structural and mechanical properties of melanins modified by RF plasma remain the same.

  14. Lage-area planar RF plasma productions by surface waves

    International Nuclear Information System (INIS)

    Nonaka, S.

    1994-01-01

    Large-area rf plasmas are confirmed to be produced by means of RF discharges inside a large-area dielectric tube. The plasma space is 73 cm x 176 cm and 2.5 cm. The plasma is thought to be produced by an odd plasma-surface wave (PSW ο ) in case of using large-area electrodes and by an even plasma-surface wave (PSW ο ) in case of without the electrodes. (author). 7 refs, 4 figs

  15. Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

    International Nuclear Information System (INIS)

    Prysiazhnyi, Vadym; Slavicek, Pavel; Klima, Milos; Mikmekova, Eliska

    2016-01-01

    This paper is aimed to show the influence of initial chemical pretreatment prior to subsequent plasma activation of aluminum surfaces. The results of our study showed that the state of the topmost surface layer (i.e. the surface morphology and chemical groups) of plasma modified aluminum significantly depends on the chemical precleaning. Commonly used chemicals (isopropanol, trichlorethane, solution of NaOH in deionized water) were used as precleaning agents. The plasma treatments were done using a radio frequency driven atmospheric pressure plasma pencil developed at Masaryk University, which operates in Ar, Ar/O 2 gas mixtures. The effectiveness of the plasma treatment was estimated by the wettability measurements, showing high wettability improvement already after 0.3 s treatment. The effects of surface cleaning (hydrocarbon removal), surface oxidation and activation (generation of OH groups) were estimated using infrared spectroscopy. The changes in the surface morphology were measured using scanning electron microscopy. Optical emission spectroscopy measurements in the near-to-surface region with temperature calculations showed that plasma itself depends on the sample precleaning procedure. (paper)

  16. Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

    Science.gov (United States)

    Vadym, Prysiazhnyi; Pavel, Slavicek; Eliska, Mikmekova; Milos, Klima

    2016-04-01

    This paper is aimed to show the influence of initial chemical pretreatment prior to subsequent plasma activation of aluminum surfaces. The results of our study showed that the state of the topmost surface layer (i.e. the surface morphology and chemical groups) of plasma modified aluminum significantly depends on the chemical precleaning. Commonly used chemicals (isopropanol, trichlorethane, solution of NaOH in deionized water) were used as precleaning agents. The plasma treatments were done using a radio frequency driven atmospheric pressure plasma pencil developed at Masaryk University, which operates in Ar, Ar/O2 gas mixtures. The effectiveness of the plasma treatment was estimated by the wettability measurements, showing high wettability improvement already after 0.3 s treatment. The effects of surface cleaning (hydrocarbon removal), surface oxidation and activation (generation of OH groups) were estimated using infrared spectroscopy. The changes in the surface morphology were measured using scanning electron microscopy. Optical emission spectroscopy measurements in the near-to-surface region with temperature calculations showed that plasma itself depends on the sample precleaning procedure.

  17. Study of RF-excited Diethylene Glycol Dimethyl Ether Plasmas by Mass Spectrometry

    International Nuclear Information System (INIS)

    Algatti, M A; Mota, R P; Júnior, P W P Moreira; Honda, R Y; Kayama, M E; Kostov, K G

    2012-01-01

    This paper deals with the study of the fragmentation process of diethylene glycol dimethyl ether (CH 3 O(CH 2 CH 2 O) 2 CH 3 ) (diglyme here in) molecule in low pressure RF excited plasma discharges. The study was carried out using mass spectrometry. The results showed that for a fixed pressure, the increase of the RF power coupled to the plasma chamber from 1 to 35 W produced a plasma environment much more reactive which increases the population of the ionized species like CH 2 + (15 amu), C 2 H 4 + (28 amu), CH 3 O + (31 amu), C 2 H 4 O + (44 amu), CH 3 OCH 2 CH 2 + (59 amu) and CH 3 OCH 2 CH 2 O + (75 amu). This fact may be attributed to the increase of the electronic temperature that makes predominant the occurrence of inelastic processes that promotes molecular fragmentation. For a fixed value of RF power the increase of pressure from 50 mTorr to 100 mTorr produces the decreasing of the above mentioned chemical species due the lower electronic mean free path. These results suggest that if one wants to keep the monomer's functionality within the plasma deposited films resulting from such kind of discharges one must operate in low power conditions.

  18. RF-Plasma Source Commissioning in Indian Negative Ion Facility

    International Nuclear Information System (INIS)

    Singh, M. J.; Bandyopadhyay, M.; Yadava, Ratnakar; Chakraborty, A. K.; Bansal, G.; Gahlaut, A.; Soni, J.; Kumar, Sunil; Pandya, K.; Parmar, K. G.; Sonara, J.; Kraus, W.; Heinemann, B.; Riedl, R.; Obermayer, S.; Martens, C.; Franzen, P.; Fantz, U.

    2011-01-01

    The Indian program of the RF based negative ion source has started off with the commissioning of ROBIN, the inductively coupled RF based negative ion source facility under establishment at Institute for Plasma research (IPR), India. The facility is being developed under a technology transfer agreement with IPP Garching. It consists of a single RF driver based beam source (BATMAN replica) coupled to a 100 kW, 1 MHz RF generator with a self excited oscillator, through a matching network, for plasma production and ion extraction and acceleration. The delivery of the RF generator and the RF plasma source without the accelerator, has enabled initiation of plasma production experiments. The recent experimental campaign has established the matching circuit parameters that result in plasma production with density in the range of 0.5-1x10 18 /m 3 , at operational gas pressures ranging between 0.4-1 Pa. Various configurations of the matching network have been experimented upon to obtain a stable operation of the set up for RF powers ranging between 25-85 kW and pulse lengths ranging between 4-20 s. It has been observed that the range of the parameters of the matching circuit, over which the frequency of the power supply is stable, is narrow and further experiments with increased number of turns in the coil are in the pipeline to see if the range can be widened. In this paper, the description of the experimental system and the commissioning data related to the optimisation of the various parameters of the matching network, to obtain stable plasma of required density, are presented and discussed.

  19. RF-Plasma Source Commissioning in Indian Negative Ion Facility

    Science.gov (United States)

    Singh, M. J.; Bandyopadhyay, M.; Bansal, G.; Gahlaut, A.; Soni, J.; Kumar, Sunil; Pandya, K.; Parmar, K. G.; Sonara, J.; Yadava, Ratnakar; Chakraborty, A. K.; Kraus, W.; Heinemann, B.; Riedl, R.; Obermayer, S.; Martens, C.; Franzen, P.; Fantz, U.

    2011-09-01

    The Indian program of the RF based negative ion source has started off with the commissioning of ROBIN, the inductively coupled RF based negative ion source facility under establishment at Institute for Plasma research (IPR), India. The facility is being developed under a technology transfer agreement with IPP Garching. It consists of a single RF driver based beam source (BATMAN replica) coupled to a 100 kW, 1 MHz RF generator with a self excited oscillator, through a matching network, for plasma production and ion extraction and acceleration. The delivery of the RF generator and the RF plasma source without the accelerator, has enabled initiation of plasma production experiments. The recent experimental campaign has established the matching circuit parameters that result in plasma production with density in the range of 0.5-1×1018/m3, at operational gas pressures ranging between 0.4-1 Pa. Various configurations of the matching network have been experimented upon to obtain a stable operation of the set up for RF powers ranging between 25-85 kW and pulse lengths ranging between 4-20 s. It has been observed that the range of the parameters of the matching circuit, over which the frequency of the power supply is stable, is narrow and further experiments with increased number of turns in the coil are in the pipeline to see if the range can be widened. In this paper, the description of the experimental system and the commissioning data related to the optimisation of the various parameters of the matching network, to obtain stable plasma of required density, are presented and discussed.

  20. Investigation of RF-enhanced plasma potentials on Alcator C-Mod

    International Nuclear Information System (INIS)

    Ochoukov, R.; Whyte, D.G.; Brunner, D.; Cziegler, I.; LaBombard, B.; Lipschultz, B.; Myra, J.; Terry, J.; Wukitch, S.

    2013-01-01

    Radio frequency (RF) sheath rectification is a leading mechanism suspected of causing anomalously high erosion of plasma facing materials in RF-heated plasmas on Alcator C-Mod. An extensive experimental survey of the plasma potential (Φ P ) in RF-heated discharges on C-Mod reveals that significant Φ P enhancement (>100 V) is found on outboard limiter surfaces, both mapped and not mapped to active RF antennas. Surfaces that magnetically map to active RF antennas show Φ P enhancement that is, in part, consistent with the recently proposed slow wave rectification mechanism. Surfaces that do not map to active RF antennas also experience significant Φ P enhancement, which strongly correlates with the local fast wave intensity. In this case, fast wave rectification is a leading candidate mechanism responsible for the observed enhancement

  1. Styrene and methyl methacrylate copolymer synthesized by RF inductively coupled plasma

    Energy Technology Data Exchange (ETDEWEB)

    Li, Z; Gillon, X; Diallo, M; Houssiau, L; Pireaux, J-J, E-mail: zhiling.li@fundp.ac.be [University of Namur (FUNDP) Research Centre in Physics of Matter and Radiation (PMR), 61, Rue de Bruxelles, 5000 Namur (Belgium)

    2011-01-01

    A series of random copolymers of styrene and methyl methacrylate was prepared on a silicon substrate by RF pulsed inductively coupled plasma. The plasma gas phase was investigated by optical emission spectroscopy (OES). The physico-chemical characteristics of the deposited copolymer films were analyzed by several surface techniques: X-ray photoelectron spectroscopy (XPS), Fourier-Transform infrared absorption (FT-IR), Time-of-flight secondary ion mass spectrometry (ToF-SIMS), etc. OES of the plasma and FT-IR spectra of the films are predictive: plasma emitting a higher relative benzyl radical signal results in the deposition of a more aromatic plasma polymer. The functional thin films can be deposited by selection of the co-monomers.

  2. Oxygen functionalization of MWCNTs in RF-dielectric barrier discharge Ar/O2 plasma

    Science.gov (United States)

    Abdel-Fattah, E.; Ogawa, D.; Nakamura, K.

    2017-07-01

    The oxygenation of multi-wall carbon nanotubes (MWCNTs) was performed via a radio frequency dielectric barrier discharge (RF-DBD) in an Ar/{{\\text{H}}2}\\text{O} plasma mixture. The relative intensity of the Ar/{{\\text{O}}2} plasma species was characterized by optical emission spectroscopy (OES). The effects of treatment time, RF power and oxygen gas percentage on the chemical composition and surface morphology of MWCNTs were investigated by means of x-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy and field emission scanning electron microscopy (FE-SEM). The results of FTIR and XPS revealed the presence of oxygen-containing functional groups on the MWCNTs treated in an Ar/{{\\text{O}}2} plasma at an RF power of 50 W and pressure of 400 Pa. The amount of oxygen functional groups (C=O, C-O, and O-COO) also increased by increasing treatment time up to 6 min, but slightly decreased when treatment time was increased by 10 min. The increase of oxygen gas percentage in the plasma mixture does not affect the oxygen content in the treated MWCNTs. Meanwhile, MWCNTs treated at high power (80 W) showed a reduction in oxygen functional groups in comparison with low RF power conditions. The Raman analysis was consistent with the XPS and FTIR results. The integrity of the nanotube patterns also remained damaged as observed by FE-SEM images. The MWCNTs treated in RF-DBD using the Ar/{{\\text{O}}2} plasma mixture showed improved dispersibility in deionized water. A correlation between the OES data and the observed surface characterization for an improved understanding of the functionalization of MWCNTs in Ar/{{\\text{O}}2} plasma was presented.

  3. Investigation of RF-enhanced plasma potentials on Alcator C-Mod

    Energy Technology Data Exchange (ETDEWEB)

    Ochoukov, R., E-mail: ochoukov@psfc.mit.edu [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States); Whyte, D.G.; Brunner, D. [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States); Cziegler, I. [Center for Energy Research, UCSD, 9500 Gilman Drive, La Jolla, CA 92093 (United States); LaBombard, B.; Lipschultz, B. [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States); Myra, J. [Lodestar Research Corporation, 2400 Central Avenue P-5, Boulder, CO 80301 (United States); Terry, J.; Wukitch, S. [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States)

    2013-07-15

    Radio frequency (RF) sheath rectification is a leading mechanism suspected of causing anomalously high erosion of plasma facing materials in RF-heated plasmas on Alcator C-Mod. An extensive experimental survey of the plasma potential (Φ{sub P}) in RF-heated discharges on C-Mod reveals that significant Φ{sub P} enhancement (>100 V) is found on outboard limiter surfaces, both mapped and not mapped to active RF antennas. Surfaces that magnetically map to active RF antennas show Φ{sub P} enhancement that is, in part, consistent with the recently proposed slow wave rectification mechanism. Surfaces that do not map to active RF antennas also experience significant Φ{sub P} enhancement, which strongly correlates with the local fast wave intensity. In this case, fast wave rectification is a leading candidate mechanism responsible for the observed enhancement.

  4. Experimental study of a RF plasma source with helicon configuration in the mix Ar/H_2. Application to the chemical etching of carbon materials surfaces in the framework of the plasma-wall interactions studies of ITER's divertor

    International Nuclear Information System (INIS)

    Bieber, T.

    2012-01-01

    The issue of the interaction wall-plasma is important in thermonuclear devices. The purpose of this work is to design a very low pressure atomic plasma source in order to study chemical etching of carbon surfaces in the same conditions as edge plasma in tokamaks. The experimental work has consisted in 2 stages: first, the characterisation of the new helicon configuration reactor developed for this research and secondly the atomic hydrogen source used for the chemical etching. The first chapter recalls what thermonuclear fusion is. The helicon configuration reactor as well as its diagnostics (optical emission spectroscopy, laser induced fluorescence - LIF, and Langmuir probe) are described in the second chapter. The third chapter deals with the different coupling modes (RF power and plasma) identified in pure argon plasmas and how they are obtained by setting experimental parameters such as injected RF power, magnetic fields or pressure. The fourth chapter is dedicated to the study of the difference in behavior between the electronic density and the relative density of metastable Ar"+ ions. The last chapter presents the results in terms of mass losses of the carbon material surfaces obtained with the atomic hydrogen source. (A.C.)

  5. Plasma edge cooling during RF heating

    International Nuclear Information System (INIS)

    Suckewer, S.; Hawryluk, R.J.

    1978-01-01

    A new approach to prevent the influx of high-Z impurities into the core of a tokamak discharge by using RF power to modify the edge plasma temperature profile is presented. This concept is based on spectroscopic measurements on PLT during ohmic heating and ATC during RF heating. A one dimensional impurity transport model is used to interpret the ATC results

  6. Role of chlorine in the nanocrystalline silicon film formation by rf plasma-enhanced chemical vapor deposition of chlorinated materials

    International Nuclear Information System (INIS)

    Shirai, Hajime

    2004-01-01

    We demonstrate the disorder-induced low-temperature crystallization in the nanocrystalline silicon film growth by rf plasma-enhanced chemical vapor deposition of H 2 -diluted SiH 2 Cl 2 and SiCl 4 . The combination of the chemical reactivity of SiCld (d: dangling bond) and SiHCl complexes and the release of the disorder-induced stress near the growing surface tightly correlate with the phase transitionity of SiCld and SiHCl complexes near the growing surface with the aid of atomic hydrogen, which induce higher degree of disorder in the a-Si network. These features are most prominent in the SiCl 4 compared with those of SiH 2 Cl 2 and SiH 4 , which preferentially enhance the nanocrystalline Si formation

  7. RF compensation of single Langmuir probe in low density helicon plasma

    Energy Technology Data Exchange (ETDEWEB)

    Ghosh, Soumen, E-mail: soumen@ipr.res.in; Chattopadhyay, Prabal K.; Ghosh, Joydeep; Bora, Dhiraj

    2016-11-15

    Highlights: • Appropriate density and temperature measurement with Langmuir probe in RF Eenvironment. • Necessity of large auxiliary electrode for RF compensation at low densities (∼10{sup 16} m{sup −3}). • Measured two temperature electrons in low pressure helicon antenna produced RF plasma. • Tail electrons are localized only at off-axis in our cylindrical plasma system. - Abstract: Interpretations of Single Langmuir probe measurements in electrode-less radio frequency (RF) plasmas are noteworthy tricky and require adequate compensation of RF. Conventional RF compensation technique is limited only at high density (>10{sup 17} m{sup −3}) RF plasmas. RF compensation of single Langmuir probe at low density RF plasmas (∼10{sup 16} m{sup −3}) is presented in this paper. In RF driven plasmas, where the RF voltage is high (∼50 V) and density is in the range (∼10{sup 16} m{sup −3}), the primary RF compensation condition (Z{sub ck} > >Z{sub sh}) is very difficult to fulfill, because of high sheath impedance (Z{sub sh}) at 13.56 MHz and the construction limitation of a self-resonant tiny chock (Z{sub ck}) with very high impedance. Introducing a large auxiliary electrode (A{sub x}), (A{sub x} >>> A{sub p}), close to the small Langmuir probe (A{sub p}) tip, connected in parallel with probe via a coupling capacitor (C{sub cp}), significantly reduces the effective sheath impedance (Z{sub sh}) and allows probe bias to follow the RF oscillation. Dimensional requirements of the auxiliary electrode and the role of suitable coupling capacitor are discussed in this paper. Observations show proper compensation leads to estimation of more positive floating potentials and lower electron temperatures compared to uncompensated probe. The electron energy probability function (EEPF) is also obtained by double differentiating the collected current with respect to the applied bias voltage using an active analog circuit.

  8. Conductivity of rf-heated plasma

    International Nuclear Information System (INIS)

    Fisch, N.J.

    1984-05-01

    The electron velocity distribution of rf-heated plasma may be so far from Maxwellian that Spitzer conductivity no longer holds. A new conductivity for such plasmas is derived and the result can be put in a remarkably general form. The new expression should be of great practical value in examining schemes for current ramp-up in tokamaks by means of lower-hybrid or other waves

  9. Diagnostic study of multiple double layer formation in expanding RF plasma

    Science.gov (United States)

    Chakraborty, Shamik; Paul, Manash Kumar; Roy, Jitendra Nath; Nath, Aparna

    2018-03-01

    Intensely luminous double layers develop and then expand in size in a visibly glowing RF discharge produced using a plasma source consisting of a semi-transparent cylindrical mesh with a central electrode, in a linear plasma chamber. Although RF discharge is known to be independent of device geometry in the absence of magnetic field, the initiation of RF discharge using such a plasma source results in electron drift and further expansion of the plasma in the vessel. The dynamics of complex plasma structures are studied through electric probe diagnostics in the expanding RF plasma. The measurements made to study the parametric dependence of evolution of double layer structures are analyzed and presented here. The plasma parameter measurements suggest that the complex potential structures initially form with low potential difference between the layers and then gradually expand producing burst oscillations. The present study provides interesting information about the stability of plasma sheath and charge particle dynamics in it that are important to understand the underlying basic sheath physics along with applications in plasma acceleration and propulsion.

  10. Effects of an RF limiter on TEXTOR's edge plasmas

    International Nuclear Information System (INIS)

    Boedo, J.A.; Sakawa, Y.; Gray, D.S.; Mank, G.; Noda, N.

    1997-01-01

    Studies directed towards the reduction of particle and heat fluxes to plasma facing components by the application of ponderomotive forces generated by radio frequency (RF) are being conducted in TEXTOR. A modified poloidal limiter is used as an antenna with up to 3 kW of RF power; the data obtained show that the plasma is repelled by the RF ponderomotive potential. The density is reduced by a factor of 2-4 and the radial decay length is substantially altered. The density near the limiter decays exponentially with RF power. The electron temperature profile changes, with the decay length becoming longer (almost flat) during the RF. The temperature in the scrape off layer (SOL) increases and its increase is roughly proportional to the RF power until it saturates, suggesting that the heating efficiency drops with power, and that improved performance is to be expected at higher powers. (orig.)

  11. Cryogenic rf test of the first SRF cavity etched in an rf Ar/Cl2 plasma

    Science.gov (United States)

    Upadhyay, J.; Palczewski, A.; Popović, S.; Valente-Feliciano, A.-M.; Im, Do; Phillips, H. L.; Vušković, L.

    2017-12-01

    An apparatus and a method for etching of the inner surfaces of superconducting radio frequency (SRF) accelerator cavities are described. The apparatus is based on the reactive ion etching performed in an Ar/Cl2 cylindrical capacitive discharge with reversed asymmetry. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity was used. The single cell cavity was mechanically polished and buffer chemically etched and then rf tested at cryogenic temperatures to provide a baseline characterization. The cavity's inner wall was then exposed to the capacitive discharge in a mixture of Argon and Chlorine. The inner wall acted as the grounded electrode, while kept at elevated temperature. The processing was accomplished by axially moving the dc-biased, corrugated inner electrode and the gas flow inlet in a step-wise manner to establish a sequence of longitudinally segmented discharges. The cavity was then tested in a standard vertical test stand at cryogenic temperatures. The rf tests and surface condition results, including the electron field emission elimination, are presented.

  12. Cryogenic rf test of the first SRF cavity etched in an rf Ar/Cl2 plasma

    Directory of Open Access Journals (Sweden)

    J. Upadhyay

    2017-12-01

    Full Text Available An apparatus and a method for etching of the inner surfaces of superconducting radio frequency (SRF accelerator cavities are described. The apparatus is based on the reactive ion etching performed in an Ar/Cl2 cylindrical capacitive discharge with reversed asymmetry. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity was used. The single cell cavity was mechanically polished and buffer chemically etched and then rf tested at cryogenic temperatures to provide a baseline characterization. The cavity’s inner wall was then exposed to the capacitive discharge in a mixture of Argon and Chlorine. The inner wall acted as the grounded electrode, while kept at elevated temperature. The processing was accomplished by axially moving the dc-biased, corrugated inner electrode and the gas flow inlet in a step-wise manner to establish a sequence of longitudinally segmented discharges. The cavity was then tested in a standard vertical test stand at cryogenic temperatures. The rf tests and surface condition results, including the electron field emission elimination, are presented.

  13. Pyrolysis treatment of waste tire powder in a capacitively coupled RF plasma reactor

    Energy Technology Data Exchange (ETDEWEB)

    Huang, H. [Department of Environmental Engineering, Guangdong University of Technology, Waihuanxi Road, Guangzhou 510006 (China); Tang, L. [Department of Civil Engineering, Guangzhou University, Waihuanxi Road, Guangzhou 510006 (China)

    2009-03-15

    A capacitively coupled radio-frequency (RF) plasma reactor was tested mainly for the purpose of solid waste treatment. It was found that using a RF input power between 1600 and 2000 W and a reactor pressure between 3000 and 8000 Pa (absolute pressure), a reactive plasma environment with a gas temperature between 1200 and 1800 K can be reached in this lab scale reactor. Under these conditions, pyrolysis of tire powder gave two product streams: a combustible gas and a pyrolytic char. The major components of the gas product are H{sub 2}, CO, CH{sub 4}, and CO{sub 2} The physical properties (surface area, porosity, and particle morphology) as well as chemical properties (elemental composition, heating value, and surface functional groups) of the pyrolytic char has also been examined. (author)

  14. Revisiting the Anomalous rf Field Penetration into a Warm Plasma

    International Nuclear Information System (INIS)

    Kaganovich, Igor D.; Polomarov, Oleg V.; Theodosiou, Constantine E.

    2005-01-01

    Radio-frequency [rf] waves do not penetrate into a plasma and are damped within it. The electric field of the wave and plasma current are concentrated near the plasma boundary in a skin layer. Electrons can transport the plasma current away from the skin layer due to their thermal motion. As a result, the width of the skin layer increases when electron temperature effects are taken into account. This phenomenon is called anomalous skin effect. The anomalous penetration of the rf electric field occurs not only for transversely propagating to the plasma boundary wave (inductively coupled plasmas) but also for the wave propagating along the plasma boundary (capacitively coupled plasmas). Such anomalous penetration of the rf field modifies the structure of the capacitive sheath. Recent advances in the nonlinear, non-local theory of the capacitive sheath are reported. It is shown that separating the electric field profile into exponential and non-exponential parts yields an efficient qualitative and quantitative description of the anomalous skin effect in both inductively and capacitively coupled plasma

  15. Effects of rf power on chemical composition and surface roughness of glow discharge polymer films

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Ling; He, Xiaoshan; Chen, Guo; Wang, Tao; Tang, Yongjian; He, Zhibing, E-mail: hezhibing802@163.com

    2016-03-15

    Graphical abstract: - Highlights: • The growth mechanism of defects in GDP films was studied upon plasma diagnosis. • Increasing rf power enhanced the etching effects of smaller-mass species. • The “void” defect was caused by high energy hydrocarbons bombardment on the surface. • The surface roughness was only 12.76 nm, and no “void” defect was observed at 30 W. - Abstract: The glow discharge polymer (GDP) films for laser fusion targets were successfully fabricated by plasma enhanced chemical vapor deposition (PECVD) at different radio frequency (rf) powers. The films were deposited using trans-2-butene (T{sub 2}B) mixed with hydrogen as gas sources. The composition and state of plasma were diagnosed by quadrupole mass spectrometer (QMS) and Langmuir probe during the deposition process. The composition, surface morphology and roughness were investigated by Fourier transform infrared spectroscopy (FTIR), scanning electron microscope (SEM) and white-light interferometer (WLI), respectively. Based on these observation and analyses, the growth mechanism of defects in GDP films were studied. The results show that, at low rf power, there is a larger probability for secondary polymerization and formation of multi-carbon C-H species in the plasma. In this case, the surface of GDP film turns to be cauliflower-like. With the increase of rf power, the degree of ionization is high, the relative concentration of smaller-mass hydrocarbon species increases, while the relative concentration of larger-mass hydrocarbon species decreases. At higher rf power, the energy of smaller-mass species are high and the etching effects are strong correspondingly. The GDP film's surface roughness shows a trend of decrease firstly and then increase with the increasing rf power. At rf power of 30 W, the surface root-mean-square roughness (Rq) drops to the lowest value of 12.8 nm, and no “void” defect was observed.

  16. Direct synthesis of nano-sized glass powders with spherical shape by RF (radio frequency) thermal plasma

    International Nuclear Information System (INIS)

    Seo, J.H.; Kim, J.S.; Lee, M.Y.; Ju, W.T.; Nam, I.T.

    2011-01-01

    A new route for obtaining very small, spheroid glass powders is demonstrated using an RF (radio frequency) thermal plasma system. During the process, four kinds of chemicals, here SiO 2 , B 2 O 3 , BaCO 3 , and K 2 CO 3 , were mixed at pre-set weight ratios, spray-dried, calcined at 250 deg. C for 3 h, and crushed into fragments. Then, they were successfully reformed into nano-sized amorphous powders (< 200 nm) with spherical shape by injecting them along the centerline of an RF thermal plasma reactor at ∼ 24 kW. The as-synthesized powders show negligible (< 1%) composition changes when compared with the injected precursors of raw material compounds.

  17. Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

    Czech Academy of Sciences Publication Activity Database

    Prysiazhnyi, V.; Slavíček, P.; Mikmeková, Eliška; Klíma, M.

    2016-01-01

    Roč. 18, č. 4 (2016), s. 430-437 ISSN 1009-0630 Institutional support: RVO:68081731 Keywords : atmospheric pressure plasma * plasma jet * aluminium * surface treatment * surface processing * chemical precleaning Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 0.830, year: 2016

  18. The effect of phase difference between powered electrodes on RF plasmas

    International Nuclear Information System (INIS)

    Proschek, M; Yin, Y; Charles, C; Aanesland, A; McKenzie, D R; Bilek, M M; Boswell, R W

    2005-01-01

    This paper presents the results of measurements carried out on plasmas created in five different RF discharge systems. These systems all have two separately powered RF (13.56 MHz) electrodes, but differ in overall size and in the geometry of both vacuum chambers and RF electrodes or antennae. The two power supplies were synchronized with a phase-shift controller. We investigated the influence of the phase difference between the two RF electrodes on plasma parameters and compared the different system geometries. Single Langmuir probes were used to measure the plasma parameters in a region between the electrodes. Floating potential and ion density were affected by the phase difference and we found a strong influence of the system geometry on the observed phase difference dependence. Both ion density and floating potential curves show asymmetries around maxima and minima. These asymmetries can be explained by a phase dependence of the time evolution of the electrode-wall coupling within an RF-cycle resulting from the asymmetric system geometry

  19. Temporally resolved ozone distribution of a time modulated RF atmospheric pressure argon plasma jet: flow, chemical reaction, and transient vortex

    International Nuclear Information System (INIS)

    Zhang, S; Sobota, A; Van Veldhuizen, E M; Bruggeman, P J

    2015-01-01

    The ozone density distribution in the effluent of a time modulated RF atmospheric pressure plasma jet (APPJ) is investigated by time and spatially resolved by UV absorption spectroscopy. The plasma jet is operated with an averaged dissipated power of 6.5 W and gas flow rate 2 slm argon  +2% O 2 . The modulation frequency of the RF power is 50 Hz with a duty cycle of 50%. To investigate the production and destruction mechanism of ozone in the plasma effluent, the atomic oxygen and gas temperature is also obtained by TALIF and Rayleigh scattering, respectively. A temporal increase in ozone density is observed close to the quartz tube exit when the plasma is switched off due to the decrease in O density and gas temperature. Ozone absorption at different axial positions indicates that the ozone distribution is dominated by the convection induced by the gas flow and allows estimating the on-axis local gas velocity in the jet effluent. Transient vortex structures occurring during the switch on and off of the RF power also significantly affect the ozone density in the far effluent. (paper)

  20. Comparative Analysis of Carbon Plasma in Arc and RF Reactors

    International Nuclear Information System (INIS)

    Todorovic-Markovic, B.; Markovic, Z.; Mohai, I.; Szepvolgyi, J.

    2004-01-01

    Results on studies of molecular spectra emitted in the initial stages of fullerene formation during the processing of graphite powder in induction RF reactor and evaporation of graphite electrodes in arc reactor are presented in this paper. It was found that C2 radicals were dominant molecular species in both plasmas. C2 radicals have an important role in the process of fullerene synthesis. The rotational-vibrational temperatures of C2 and CN species were calculated by fitting the experimental spectra to the simulated ones. The results of optical emission study of C2 radicals generated in carbon arc plasma have shown that rotational temperature of C2 species depends on carbon concentration and current intensity significantly. The optical emission study of induction RF plasma and SEM analysis of graphite powder before and after plasma treatment have shown that evaporation of the processed graphite powder depends on feed rate and composition of gas phase significantly. Based on the obtained results, it was concluded that in the plasma region CN radicals could be formed by the reaction of C2 species with atomic nitrogen at smaller loads. At larger feed rate of graphite powder, CN species were produced by surface reaction of the hot carbon particles with nitrogen atoms. The presence of nitrogen in induction RF plasma reduces the fullerene yield significantly. The fullerene yield obtained in two different reactors was: 13% in arc reactor and 4.1% in induction RF reactor. However, the fullerene production rate was higher in induction RF reactor-6.4 g/h versus 1.7 g/h in arc reactor

  1. Particle melting and particle/plasma interactions in DC and RF plasmas: a modeling study. (Volumes I and II)

    International Nuclear Information System (INIS)

    Wei, D.Y.C.

    1987-01-01

    Integral process models were developed to predict particle melting in both DC and RF plasmas. Specifically, a numerical model has been developed to predict the temperature history of particles injected in a low pressure DC plasma jet. The temperature and velocity fields of the plasma jet are predicted as a free jet by solving the parabolized Navier-Stokes equations using a spatial marching scheme. Correction factors were introduced to take into account non continuum effects encountered in the low pressure environment. The plasma jet profiles as well as the particle/plasma interactions under different jet pressure ratios (from underexpanded to overexpanded) were investigated. The flow and temperature fields in the RF plasma torch are calculated using the axisymmetric Navier-Stokes equations based on the primitive variables, along with pseudo two-dimensional electromagnetic field equations. Particle trajectories and heat transfer characteristics in both DC and RF plasmas are calculated using predicted plasma jet profiles. Particle melting efficiencies in both DC and RF plasmas are evaluated and compared using model alloy systems. Based on the theoretical considerations, an alternative route of plasma spraying process (hybrid plasma spraying process) is proposed. An evaluation of particle melting in hybrid plasma jets had indicated that further improvement in deposit properties could be made

  2. Rf-biasing of highly idealized plasmas

    NARCIS (Netherlands)

    Westermann, R.H.J.; Blauw, M.A.; Goedheer, W.J.; Sanden, van de M.C.M.; Schmidt, J.; Simek, M.; Pekarek, S.; Prukner, V.

    2007-01-01

    Remote plasmas, which are subjected to a radio-frequency (RF) biased surface, have been investigated theoretically and experimentally for decades. The relation between the complex power (DC) voltage characteristics, the ion energy distribution and control losses of the ion bombardment are of

  3. Modelling RF-plasma interaction in ECR ion sources

    Directory of Open Access Journals (Sweden)

    Mascali David

    2017-01-01

    Full Text Available This paper describes three-dimensional self-consistent numerical simulations of wave propagation in magnetoplasmas of Electron cyclotron resonance ion sources (ECRIS. Numerical results can give useful information on the distribution of the absorbed RF power and/or efficiency of RF heating, especially in the case of alternative schemes such as mode-conversion based heating scenarios. Ray-tracing approximation is allowed only for small wavelength compared to the system scale lengths: as a consequence, full-wave solutions of Maxwell-Vlasov equation must be taken into account in compact and strongly inhomogeneous ECRIS plasmas. This contribution presents a multi-scale temporal domains approach for simultaneously including RF dynamics and plasma kinetics in a “cold-plasma”, and some perspectives for “hot-plasma” implementation. The presented results rely with the attempt to establish a modal-conversion scenario of OXB-type in double frequency heating inside an ECRIS testbench.

  4. Modelling of an RF plasma shower

    NARCIS (Netherlands)

    Atanasova, M.; Carbone, E.A.D.; Mihailova, D.B.; Benova, E.; Degrez, G.; Mullen, van der J.J.A.M.

    2012-01-01

    A capacitive radiofrequency (RF) discharge at atmospheric pressure is studied by means of a time-dependent, two-dimensional fluid model. The plasma is created in a stationary argon gas flow guided through two perforated electrodes, hence resembling a shower. The inner electrode, the electrode facing

  5. Coupling of RF antennas to large volume helicon plasma

    Directory of Open Access Journals (Sweden)

    Lei Chang

    2018-04-01

    Full Text Available Large volume helicon plasma sources are of particular interest for large scale semiconductor processing, high power plasma propulsion and recently plasma-material interaction under fusion conditions. This work is devoted to studying the coupling of four typical RF antennas to helicon plasma with infinite length and diameter of 0.5 m, and exploring its frequency dependence in the range of 13.56-70 MHz for coupling optimization. It is found that loop antenna is more efficient than half helix, Boswell and Nagoya III antennas for power absorption; radially parabolic density profile overwhelms Gaussian density profile in terms of antenna coupling for low-density plasma, but the superiority reverses for high-density plasma. Increasing the driving frequency results in power absorption more near plasma edge, but the overall power absorption increases with frequency. Perpendicular stream plots of wave magnetic field, wave electric field and perturbed current are also presented. This work can serve as an important reference for the experimental design of large volume helicon plasma source with high RF power.

  6. Room-temperature plasma-enhanced chemical vapor deposition of SiOCH films using tetraethoxysilane

    International Nuclear Information System (INIS)

    Yamaoka, K.; Yoshizako, Y.; Kato, H.; Tsukiyama, D.; Terai, Y.; Fujiwara, Y.

    2006-01-01

    Carbon-doped silicon oxide (SiOCH) thin films were deposited by room-temperature plasma-enhanced chemical vapor deposition (PECVD) using tetraethoxysilane (TEOS). The deposition rate and composition of the films strongly depended on radio frequency (RF) power. The films deposited at low RF power contained more CH n groups. The SiOCH films showed high etch rate and low refractive index in proportion to the carbon composition. The deposition with low plasma density and low substrate temperature is effective for SiOCH growth by PECVD using TEOS

  7. Selection of suitable diagnostic techniques for an RF atmospheric pressure plasma

    International Nuclear Information System (INIS)

    Kong, M.G.; Deng, X.T.

    2001-01-01

    As an early report of our study, this paper summaries the RF atmospheric pressure plasma system we intend to characterize and a number of diagnostic techniques presently under assessment for our plasma rig. By discussing the advantages and disadvantages of these diagnostic techniques at this meeting, we hope to gain feedback and comments to improve our choice of appropriate diagnostic techniques as well as our subsequent application of these techniques to nonthermal RF atmospheric pressure plasmas

  8. On the distribution of plasma parameters in RF glow discharge

    International Nuclear Information System (INIS)

    Ning Cheng; Liu Zuli; Liu Donghui; Han Caiyuan.

    1993-01-01

    A self-consistent numerical model based on the two-fluid equations for describing the transport of charged particles in the RF glow discharge is presented. For a plasma generator filled with low-pressure air and parallel-plate electrodes, the model is numerical solved. The space-time distribution of parameters and the spatial distribution of some time-averaged parameters in plasma, which show the physical picture of the RF glow discharge, are obtained

  9. Process for titanium powders spheroidization by RF induction plasma

    International Nuclear Information System (INIS)

    Gu Zhongtao; Ye Gaoying; Liu Chuandong; Tong Honghui

    2010-01-01

    Spherical titanium (Ti) particles were obtained by the process of heating irregularly shaped Ti powders under the radio frequency induction plasma (RF induction plasma) condition. The effect of feed rate, various dispersion methods and Ti particle size on the spheroidization efficiency was studied. The efficiency of the spheroidization is evaluated through the measurements of the percentage of powder spheroidized based on the electron microscopic observations and the tap density measurement of the processed powder. During the short flight of the particles in the plasma flow, of the order of a few milliseconds, the individual titanium particles of the powder are heated and melt, forming a spherical liquid droplet which upon freezing gives rise to the formation of a perfectly dense spherical solid particle. So RF induction plasma is a promising method for the preparation of spherical titanium powders with high flow ability. (authors)

  10. RF wave simulation for cold edge plasmas using the MFEM library

    Science.gov (United States)

    Shiraiwa, S.; Wright, J. C.; Bonoli, P. T.; Kolev, T.; Stowell, M.

    2017-10-01

    A newly developed generic electro-magnetic (EM) simulation tool for modeling RF wave propagation in SOL plasmas is presented. The primary motivation of this development is to extend the domain partitioning approach for incorporating arbitrarily shaped SOL plasmas and antenna to the TORIC core ICRF solver, which was previously demonstrated in the 2D geometry [S. Shiraiwa, et. al., "HISTORIC: extending core ICRF wave simulation to include realistic SOL plasmas", Nucl. Fusion in press], to larger and more complicated simulations by including a 3D realistic antenna and integrating RF rectified sheath potential model. Such an extension requires a scalable high fidelity 3D edge plasma wave simulation. We used the MFEM [http://mfem.org], open source scalable C++ finite element method library, and developed a Python wrapper for MFEM (PyMFEM), and then a radio frequency (RF) wave physics module in Python. This approach allows for building a physics layer rapidly, while separating the physics implementation being apart from the numerical FEM implementation. An interactive modeling interface was built on pScope [S Shiraiwa, et. al. Fusion Eng. Des. 112, 835] to work with an RF simulation model in a complicated geometry.

  11. Physics-electrical hybrid model for real time impedance matching and remote plasma characterization in RF plasma sources.

    Science.gov (United States)

    Sudhir, Dass; Bandyopadhyay, M; Chakraborty, A

    2016-02-01

    Plasma characterization and impedance matching are an integral part of any radio frequency (RF) based plasma source. In long pulse operation, particularly in high power operation where plasma load may vary due to different reasons (e.g. pressure and power), online tuning of impedance matching circuit and remote plasma density estimation are very useful. In some cases, due to remote interfaces, radio activation and, due to maintenance issues, power probes are not allowed to be incorporated in the ion source design for plasma characterization. Therefore, for characterization and impedance matching, more remote schemes are envisaged. Two such schemes by the same authors are suggested in these regards, which are based on air core transformer model of inductive coupled plasma (ICP) [M. Bandyopadhyay et al., Nucl. Fusion 55, 033017 (2015); D. Sudhir et al., Rev. Sci. Instrum. 85, 013510 (2014)]. However, the influence of the RF field interaction with the plasma to determine its impedance, a physics code HELIC [D. Arnush, Phys. Plasmas 7, 3042 (2000)] is coupled with the transformer model. This model can be useful for both types of RF sources, i.e., ICP and helicon sources.

  12. RF current drive and plasma fluctuations

    International Nuclear Information System (INIS)

    Peysson, Yves; Decker, Joan; Morini, L; Coda, S

    2011-01-01

    The role played by electron density fluctuations near the plasma edge on rf current drive in tokamaks is assessed quantitatively. For this purpose, a general framework for incorporating density fluctuations in existing modelling tools has been developed. It is valid when rf power absorption takes place far from the fluctuating region of the plasma. The ray-tracing formalism is modified in order to take into account time-dependent perturbations of the density, while the Fokker–Planck solver remains unchanged. The evolution of the electron distribution function in time and space under the competing effects of collisions and quasilinear diffusion by rf waves is determined consistently with the time scale of fluctuations described as a statistical process. Using the ray-tracing code C3PO and the 3D linearized relativistic bounce-averaged Fokker–Planck solver LUKE, the effect of electron density fluctuations on the current driven by the lower hybrid (LH) and the electron cyclotron (EC) waves is estimated quantitatively. A thin fluctuating layer characterized by electron drift wave turbulence at the plasma edge is considered. The effect of fluctuations on the LH wave propagation is equivalent to a random scattering process with a broadening of the poloidal mode spectrum proportional to the level of the perturbation. However, in the multipass regime, the LH current density profile remains sensitive to the ray chaotic behaviour, which is not averaged by fluctuations. The effect of large amplitude fluctuations on the EC driven current is found to be similar to an anomalous radial transport of the fast electrons. The resulting lower current drive efficiency and broader current profile are in better agreement with experimental observations. Finally, applied to the ITER ELMy H-mode regime, the model predicts a significant broadening of the EC driven current density profile with the fluctuation level, which can make the stabilization of neoclassical tearing mode potentially

  13. Voltage uniformity study in large-area reactors for RF plasma deposition

    Energy Technology Data Exchange (ETDEWEB)

    Sansonnens, L.; Pletzer, A.; Magni, D.; Howling, A.A.; Hollenstein, C. [Ecole Polytechnique Federale, Lausanne (Switzerland). Centre de Recherche en Physique des Plasma (CRPP); Schmitt, J.P.M. [Balzers Process Systems, Palaiseau (France)

    1996-09-01

    Non-uniform voltage distribution across the electrode area results in inhomogeneous thin-film RF plasma deposition in large area reactors. In this work, a two-dimensional analytic model for the calculation of the voltage distribution across the electrode area is presented. The results of this model are in good agreement with measurements performed without plasma at 13.56 MHz and 70 MHz in a large area reactor. The principal voltage inhomogeneities are caused by logarithmic singularities in the vicinity of RF connections and not by standing waves. These singularities are only described by a two-dimensional model and cannot be intuitively predicted by analogy to a one-dimensional case. Plasma light emission measurements and thickness homogeneity studies of a-Si:H films show that the plasma reproduces these voltage inhomogeneities. Improvement of the voltage uniformity is investigated by changing the number and position of the RF connections. (author) 13 figs., 20 refs.

  14. Study on the RF power necessary to ignite plasma for the ICP test facility at HUST

    Energy Technology Data Exchange (ETDEWEB)

    Yue, Haikun [School of Electronic Information and Communications, Huazhong University of Science and Technology, Wuhan (China); State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan (China); Li, Dong; Wang, Chenre; Li, Xiaofei; Chen, Dezhi; Liu, Kaifeng; Zhou, Chi; Pan, Ruimin [State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan (China)

    2015-10-15

    An Radio-Frequency (RF) Inductively Coupled Plasma (ICP) ion source test facility has been successfully developed at Huazhong University of Science and Technology (HUST). As part of a study on hydrogen plasma, the influence of three main operation parameters on the RF power necessary to ignite plasma was investigated. At 6 Pa, the RF power necessary to ignite plasma influenced little by the filament heating current from 5 A to 9 A. The RF power necessary to ignite plasma increased rapidly with the operation pressure decreasing from 8 Pa to 4 Pa. The RF power necessary to ignite plasma decreased with the number of coil turns from 6 to 10. During the experiments, plasma was produced with the electron density of the order of 10{sup 16}m{sup -3} and the electron temperature of around 4 eV. (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  15. Current sustaining by RF travelling field in a collisional toroidal plasma

    International Nuclear Information System (INIS)

    Fukuda, Masaji; Matsuura, Kiyokata

    1978-01-01

    The relation between the current generated by RF travelling field and the absorbed power is studied in a collisional toroidal plasma, parameters being phase velocity and filling gap pressure or electron collision frequency. It is observed at a low magnetic field that the current is proportional to the plasma conductivity and an effective electromotive force, which is a new concept introduced on the basis of fluid model; the electromotive force is proportional to the absorbed RF power and inversely proportional to the plasma density and the phase velocity of the travelling field. (author)

  16. Current sustaining by RF travelling field in a collisional toroidal plasma

    International Nuclear Information System (INIS)

    Fukuda, Masaji; Matsuura, Kiyokata.

    1977-06-01

    The relation between the current generation by RF travelling field and the accompanied power absorption is studied in a collisional toroidal plasma, parameters being phase velocity and filling gas pressure or electron collision frequency. It is observed at a low magnetic field that the current is proportional to the plasma conductivity and an effective electromotive force, which is a new concept introduced on the basis of fluid model; the electromotive force is proportional to the absorbed RF power and inversely proportional to the plasma density and the phase velocity of the travelling field. (auth.)

  17. Poloidal plasma rotation in the presence of RF waves in tokamaks

    International Nuclear Information System (INIS)

    Weyssow, B.; Liu, Caigen

    2001-01-01

    It is well known that one of the consequences of strong RF heating is the deformation of the equilibrium distribution function that induces a change in plasma transport and plasma rotation. The poloidal plasma rotation during RF wave heating in tokamaks is investigated using a moment approach. A set of closed, self-consistent transport and rotation equations is derived and reduced to a single equation for the poloidal particle flux. The formulas are sufficiently general to apply to heating schemes that can be represented by a quasilinear operator. (author)

  18. Plasma rotation and rf heating in DIII-D

    International Nuclear Information System (INIS)

    DeGrassie, J.S.; Baker, D.R.; Burrell, K.H.

    1999-05-01

    In a variety of discharge conditions on DIII-D it is observed that rf electron heating reduces the toroidal rotation speed and core ion temperature. The rf heating can be with either fast wave or electron cyclotron heating and this effect is insensitive to the details of the launched toroidal wavenumber spectrum. To date all target discharges have rotation first established with co-directed neutral beam injection. A possible cause is enhanced ion momentum and thermal diffusivity due to electron heating effectively creating greater anomalous viscosity. Another is that a counter directed toroidal force is applied to the bulk plasma via rf driven radial current

  19. Plasma rotation and rf heating in DIII-D

    International Nuclear Information System (INIS)

    Grassie, J. S. de; Baker, D. R.; Burrell, K. H.; Greenfield, C. M.; Lin-Liu, Y. R.; Luce, T. C.; Petty, C. C.; Prater, R.; Heidbrink, W. W.; Rice, B. W.

    1999-01-01

    In a variety of discharge conditions on DIII-D it is observed that rf electron heating reduces the toroidal rotation speed and core ion temperature. The rf heating can be with either fast wave or electron cyclotron heating and this effect is insensitive to the details of the launched toroidal wavenumber spectrum. To date all target discharges have rotation first established with co-directed neutral beam injection. A possible cause is enhanced ion momentum and thermal diffusivity due to electron heating effectively creating greater anomalous viscosity. Another is that a counter directed toroidal force is applied to the bulk plasma via rf driven radial current. (c) 1999 American Institute of Physics

  20. A Tightly Coupled Non-Equilibrium Magneto-Hydrodynamic Model for Inductively Coupled RF Plasmas

    Science.gov (United States)

    2016-02-29

    development a tightly coupled magneto-hydrodynamic model for Inductively Coupled Radio- Frequency (RF) Plasmas. Non Local Thermodynamic Equilibrium (NLTE...for Inductively Coupled Radio-Frequency (RF) Plasmas. Non Local Thermodynamic Equilibrium (NLTE) effects are described based on a hybrid State-to-State...Inductively Coupled Plasma (ICP) torches have wide range of possible applications which include deposition of metal coatings, synthesis of ultra-fine powders

  1. Dynamics of r.f. production of Stellarator plasmas in the ion cyclotron range of frequency

    International Nuclear Information System (INIS)

    Moiseenko, V.E.; Lysoivan, A.I.; Kasilov, S.V.; Plyusnin, V.V.

    1995-01-01

    The present study investigated numerically the process of r.f. production of plasma in the URAGAN-3M torsatron in the frequency range below the ion cyclotron frequency (ω ci ). The dynamics of r.f. plasma build-up at the stages of neutral gas burnout and plasma heating were studied using a zero-dimensional transport code, in which the plasma confinement law was determined by large helical device scaling. Two models for input r.f. power were used. In the first case, the r.f. power absorbed by the electrons was computed by a one-dimensional r.f. code solving Maxwell's boundary problem equations. The mechanisms of electron heating through direct excitation of the slow wave (SW) by antennae as well as the conversion of fast wave (FW) into SW in the vicinity of Alfven resonance (scenario of Alfven heating) were taken into account in the computations. In the second case, an 'ideal' model of r.f. power deposition onto the electrons as a linear function of plasma density was employed. A noticeable difference in plasma production dynamics computed for these two cases was found. Better agreement with experimental data obtained from the URAGAN-3M torsatron was found for the first case resulting from combination of the one-dimensional r.f. and zero-dimensional transport codes. ((orig.))

  2. Microparticles in a RF plasma under hyper gravity conditions

    NARCIS (Netherlands)

    Beckers, J.; Stoffels, W.W.; Ockenga, T.; Wolter, M.; Kersten, H.

    2009-01-01

    Summary form only given: For diagnostic purposes micrometer-sized particles can be used as floating electrostatic probes. Once injected into a complex rf plasma, these particles will become negatively charged and can be trapped in the plasma sheath due to an equilibrium of several forces working on

  3. Effect on antenna structure of high power rf during plasma operation

    International Nuclear Information System (INIS)

    Haste, G.R.; Thomas, C.E.; Fadnek, A.; Carter, M.D.; Beaumont, B.; Becoulet, A.; Kuus, H.; Saoutic, B.

    1993-01-01

    High-power, long-pulse operation on the Tore Supra tokamak results in considerable stress on the plasma-facing components. The ICH antennas must deliver high-power rf(up to 4 MW per antenna) in this environment. The antenna structure is therefore subjected to the power flux resulting from the interaction between rf and the edge plasma. The structure's response during operation is described, as is the condition of the antenna after prolonged use

  4. Experimental study of the interaction between RF antennas and the edge plasma of a tokamak

    International Nuclear Information System (INIS)

    Kubic, Martin

    2013-01-01

    Antennas operating in the ion cyclotron range of frequency (ICRF) provide a useful tool for plasma heating in many tokamaks and are foreseen to play an important role in ITER. However, in addition to the desired heating in the core plasma, spurious interactions with the plasma edge and material boundary are known to occur. Many of these deleterious effects are caused by the formation of radio-frequency (RF) sheaths. The aim of this thesis is to study, mainly experimentally, scrape-off layer (SOL) modifications caused by RF sheaths effects by means of Langmuir probes that are magnetically connected to a powered ICRH antenna. Effects of the two types of Faraday screens' operation on RF-induced SOL modifications are studied for different plasma and antenna configurations - scans of strap power ratio imbalance, injected power and SOL density. In addition to experimental work, the influence of RF sheaths on retarding field analyzer (RFA) measurements of sheath potential is investigated with one-dimensional particle-in-cell code. One-dimensional particle-in-cell simulations show that the RFA is able to measure reliably the sheath potential only for ion plasma frequencies ω π similar to RF cyclotron frequency ω rf , while for the real SOL conditions (ω π ≥ ω rf ), when the RFA is magnetically connected to RF region, it is strongly underestimated. An alternative method to investigate RF sheaths effects is proposed by using broadening of the ion distribution function as an evidence of the RF electric fields in the sheath. RFA measurements in Tore Supra indicate that RF potentials do indeed propagate from the antenna 12 m along magnetic field lines. (author) [fr

  5. “Virtual IED sensor” at an rf-biased electrode in low-pressure plasma

    Energy Technology Data Exchange (ETDEWEB)

    Bogdanova, M. A.; Zyryanov, S. M. [Skobeltsyn Institute of Nuclear Physics, Moscow State University, SINP MSU, Moscow (Russian Federation); Faculty of Physics, Moscow State University, MSU, Moscow (Russian Federation); Lopaev, D. V.; Rakhimov, A. T. [Skobeltsyn Institute of Nuclear Physics, Moscow State University, SINP MSU, Moscow (Russian Federation)

    2016-07-15

    Energy distribution and the flux of the ions coming on a surface are considered as the key-parameters in anisotropic plasma etching. Since direct ion energy distribution (IED) measurements at the treated surface during plasma processing are often hardly possible, there is an opportunity for virtual ones. This work is devoted to the possibility of such indirect IED and ion flux measurements at an rf-biased electrode in low-pressure rf plasma by using a “virtual IED sensor” which represents “in-situ” IED calculations on the absolute scale in accordance with a plasma sheath model containing a set of measurable external parameters. The “virtual IED sensor” should also involve some external calibration procedure. Applicability and accuracy of the “virtual IED sensor” are validated for a dual-frequency reactive ion etching (RIE) inductively coupled plasma (ICP) reactor with a capacitively coupled rf-biased electrode. The validation is carried out for heavy (Ar) and light (H{sub 2}) gases under different discharge conditions (different ICP powers, rf-bias frequencies, and voltages). An EQP mass-spectrometer and an rf-compensated Langmuir probe (LP) are used to characterize plasma, while an rf-compensated retarded field energy analyzer (RFEA) is applied to measure IED and ion flux at the rf-biased electrode. Besides, the pulsed selfbias method is used as an external calibration procedure for ion flux estimating at the rf-biased electrode. It is shown that pulsed selfbias method allows calibrating the IED absolute scale quite accurately. It is also shown that the “virtual IED sensor” based on the simplest collisionless sheath model allows reproducing well enough the experimental IEDs at the pressures when the sheath thickness s is less than the ion mean free path λ{sub i} (s < λ{sub i}). At higher pressure (when s > λ{sub i}), the difference between calculated and experimental IEDs due to ion collisions in the sheath is observed in the low

  6. A calibrated, broadband antenna for plasma RF emission measurements below 1 GHz

    International Nuclear Information System (INIS)

    Spence, P.D.; Rosenberg, D.; Roth, J.R.

    1984-01-01

    A constant impedance, constant aperture antenna can make possible broadband plasma RF emission measurements which yield relative and absolute power levels. However, good technique must be followed for the immersion of such an RF probe into plasma radiation. The authors have used a complementary conical spiral antenna to observe plasma RF emission over the frequency range 100 ≤ν≤ 1200 MHz. The RF emission was emitted by a modified Penning discharge. The RF emission from the discharge typically exhibits harmonic structure over a broad frequency range, necessitating a broadband antenna with a flat frequency response curve to allow detailed spectral analysis. The antenna consists of two metal strips of approximately uniform width wound helically on a cone made of Lexan plastic. Since the antenna is a balanced network, a balun is employed to make the transition to a 50-ohm coaxial line. The antenna feed method is critical in maintaining a uniform impedance network. Neglecting stray transmission line effects, the probe circuit for the frequency range 100 ≤ν≤ 500 MHz is 50 ohms due to the spectrum analyzer, paralleled by 291 ohms due to balun magnetization; the combination is fed by a 144 ohm probe aperture

  7. On the evaluation of currents in a tokamak plasma during combined Ohmic and RF current drive

    International Nuclear Information System (INIS)

    Eckhartt, D.

    1986-09-01

    By taking into account the rf-generated enhancement of the plasma electric conductivity (as formulated by Fisch in the limit of weak dc electric fields) a relation is derived between the ratio of rf to Ohmically driven currents and other plasma parameters to be measured before and after the rf onset under the condition of constant net plasma current. (author)

  8. RF Plasma modeling of the Linac4 H− ion source

    CERN Document Server

    Mattei, S; Hatayama, A; Lettry, J; Kawamura, Y; Yasumoto, M; Schmitzer, C

    2013-01-01

    This study focuses on the modelling of the ICP RF-plasma in the Linac4 H− ion source currently being constructed at CERN. A self-consistent model of the plasma dynamics with the RF electromagnetic field has been developed by a PIC-MCC method. In this paper, the model is applied to the analysis of a low density plasma discharge initiation, with particular interest on the effect of the external magnetic field on the plasma properties, such as wall loss, electron density and electron energy. The use of a multi-cusp magnetic field effectively limits the wall losses, particularly in the radial direction. Preliminary results however indicate that a reduced heating efficiency results in such a configuration. The effect is possibly due to trapping of electrons in the multi-cusp magnetic field, preventing their continuous acceleration in the azimuthal direction.

  9. Sheath and bulk expansion induced by RF bias in atmospheric pressure microwave plasma

    Science.gov (United States)

    Lee, Jimo; Nam, Woojin; Lee, Jae Koo; Yun, Gunsu

    2017-10-01

    A large axial volume expansion of microwave-driven plasma at atmospheric pressure is achieved by applying a low power radio frequency (RF) bias at an axial location well isolated from the original plasma bulk. The evolution of the plasma plume visualized by high speed ICCD imaging suggest that the free electrons drifting toward the bias electrode cause the prodigious expansion of the sheath, creating a stable plasma stream channel between the microwave and the RF electrodes. For argon plasma in ambient air, enhanced emissions of OH and N2 spectral lines are measured in the extended plume region, supporting the acceleration of electrons and subsequent generation of radical species. The coupling of RF bias with microwave provides an efficient way of enlarging the plasma volume and enhancing the production of radicals. Work supported by the National Research Foundation of Korea under BK21+ program and Grant No. 2015R1D1A1A01061556 (Ministry of Education).

  10. Optical characteristics of a RF DBD plasma jet in various A r / O 2 ...

    Indian Academy of Sciences (India)

    Using the optical emission spectrum analysis of the RF plasma jet, the excitation temperature is determined based on the Boltzmann plot method. The electron density in the plasma medium of the RF plasma jet is obtained by the Stark broadening of the hydrogen Balmer H β . It is mostly seen that, the radiation intensity of Ar ...

  11. Pressure dependence of electron temperature using rf-floated electrostatic probes in rf plasmas

    International Nuclear Information System (INIS)

    Cantin, A.; Gagne, R.R.J.

    1977-01-01

    A new technique, which eliminates ac between probe and plasma by means of a ''follower'', permits electrostatic probes to be used in rf plasmas with a degree of confidence and accuracy which is equal, if not better, to that for a dc discharge. Measurements in argon, using this technique, have shown that electron temperature (T/sub e/) in an rf discharge is not higher than in dc discharge. Moreover the values of T/sub e/ do not agree with von Engel's law, but are in close agreement with a theory based on free diffusion and extrapolated up to values of pR=20 Torr cm (pressure times tube radius). These results are in contradiction with published electrostatic probe results for a positive column, but agree with published results as determined by microwave radiometry and optical spectroscopy. The hypothesis is made that the supporting evidence in favor of von Engel's law, afforded by published electrostatic probe results, could be due to an artifact

  12. Investigation of the helicon discharge plasma parameters in a hybrid RF plasma system

    International Nuclear Information System (INIS)

    Aleksandrov, A. F.; Petrov, A. K.; Vavilin, K. V.; Kralkina, E. A.; Neklyudova, P. A.; Nikonov, A. M.; Pavlov, V. B.; Ayrapetov, A. A.; Odinokov, V. V.; Sologub, V. A.; Pavlov, G. Ya.

    2016-01-01

    Results of an experimental study of the helicon discharge plasma parameters in a prototype of a hybrid RF plasma system equipped with a solenoidal antenna are described. It is shown that an increase in the external magnetic field leads to the formation of a plasma column and a shift of the maximum ion current along the discharge axis toward the bottom flange of the system. The shape of the plasma column can be controlled via varying the configuration of the magnetic field.

  13. Investigation of the helicon discharge plasma parameters in a hybrid RF plasma system

    Energy Technology Data Exchange (ETDEWEB)

    Aleksandrov, A. F.; Petrov, A. K., E-mail: alpetrov57@gmail.com; Vavilin, K. V.; Kralkina, E. A.; Neklyudova, P. A.; Nikonov, A. M.; Pavlov, V. B. [Moscow State University, Faculty of Physics (Russian Federation); Ayrapetov, A. A.; Odinokov, V. V.; Sologub, V. A.; Pavlov, G. Ya. [Research Institute of Precision Engineering (Russian Federation)

    2016-03-15

    Results of an experimental study of the helicon discharge plasma parameters in a prototype of a hybrid RF plasma system equipped with a solenoidal antenna are described. It is shown that an increase in the external magnetic field leads to the formation of a plasma column and a shift of the maximum ion current along the discharge axis toward the bottom flange of the system. The shape of the plasma column can be controlled via varying the configuration of the magnetic field.

  14. The difference between the metal ion extracted from the R.F. ion source by applying plasma chemistry reaction and by non-plasma range chemistry reaction

    International Nuclear Information System (INIS)

    Bai Gui Bin

    1987-01-01

    The paper introduced the difference between using plasma chemistry reaction draw metal ion and non-plasma range chemistry reaction in the R.F. ion source. By using of the plasma chemistry reaction draw metal ion higher percentage than non-plasma range chemistry reaction in the R.F. ion source. The authors plasma chemistry reaction to R.F. ion source and implanter successfully. The effect is very well, it has its own characteristic

  15. Rf probe technology for the next generation of technological plasmas

    International Nuclear Information System (INIS)

    Law, V.J.; Kenyon, A.J.; Thornhill, N.F.; Seeds, A.J.; Batty, I.

    2001-01-01

    We describe radio frequency (rf) analysis of technological plasmas at the 13.56 MHz fundamental drive frequency and integer narrow-band harmonics up to n = 9. In particular, we demonstrate the use of harmonic amplitude information as a process end-point diagnostic. Using very high frequency (vhf) techniques, we construct non-invasive ex situ remote-coupled probes: a diplexer, an equal-ratio-arm bridge, and a dual directional coupler used as a single directional device. These probes bolt into the plasma-tool 50 Ω transmission-line between the rf generator and matching network, and hence do not require modification of the plasma tool. The 50 Ω probe environment produces repeatable measurements of the chamber capacitance and narrow-band harmonic amplitude with an end-point detection sensitivity corresponding to a 2 dB change in the harmonic amplitude with the removal of 1 cm 2 of photoresist. The methodology and design of an instrument for the measurement of the plasma-tool frequency response, and the plasma harmonic amplitude and phase response are examined. The instrument allows the monitoring of the plasma phase delay, plasma-tool short- and long-term ageing, and process end-point prediction. (author)

  16. DC plasma ion implantation in an inductively coupled RF plasma

    International Nuclear Information System (INIS)

    Silawatshananai, C.; Matan, N.; Pakpum, C.; Pussadee, N.; Srisantitam, P.; Davynov, S.; Vilaithong, T.

    2004-01-01

    Various modes of plasma ion implantation have been investigated in a small inductively coupled 13.6 MHz RF plasma source. Plasma ion implantation with HVDC(up to -10 kV bias) has been investigated in order to incorporate with the conventional implantation of diamond like carbon. In this preliminary work, nitrogen ions are implanted into the stainless steel sample with a dose of 5.5 x 10 -2 cm for a short implanting time of 7 minutes without target cooling. Surface properties such as microhardness, wear rate and the friction coefficient have been improved. X-ray and SEM analyses show distinct structural changes on the surface. A combination of sheath assisted implantation and thermal diffusion may be responsible for improvement in surface properties. (orig.)

  17. Study of Pulsed vs. RF Plasma Properties for Surface Processing Applications

    Science.gov (United States)

    Tang, Ricky; Hopkins, Matthew; Barnat, Edward; Miller, Paul

    2015-09-01

    The ability to manipulate the plasma parameters (density, E/N) was previously demonstrated using a double-pulsed column discharge. Experiments extending this to large-surface plasmas of interest to the plasma processing community were conducted. Differences between an audio-frequency pulsed plasma and a radio-frequency (rf) discharge, both prevalent in plasma processing applications, were studied. Optical emission spectroscopy shows higher-intensity emission in the UV/visible range for the pulsed plasma comparing to the rf plasma at comparable powers. Data suggest that the electron energy is higher for the pulsed plasma leading to higher ionization, resulting in increased ion density and ion flux. Diode laser absorption measurements of the concentration of the 1S5 metastable and 1S4 resonance states of argon (correlated with the plasma E/N) provide comparisons between the excitation/ionization states of the two plasmas. Preliminary modeling efforts suggest that the low-frequency polarity switch causes a much more abrupt potential variation to support interesting transport phenomena, generating a ``wave'' of higher temperature electrons leading to more ionization, as well as ``sheath capture'' of a higher density bolus of ions that are then accelerated during polarity switch.

  18. Plasma properties of RF magnetron sputtering system using Zn target

    Energy Technology Data Exchange (ETDEWEB)

    Nafarizal, N.; Andreas Albert, A. R.; Sharifah Amirah, A. S.; Salwa, O.; Riyaz Ahmad, M. A. [Microelectronic and Nanotechnology - Shamsuddin Research Centre (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia 86400 Parit Raja, Batu Pahat, Johor (Malaysia)

    2012-06-29

    In the present work, we investigate the fundamental properties of magnetron sputtering plasma using Zn target and its deposited Zn thin film. The magnetron sputtering plasma was produced using radio frequency (RF) power supply and Argon (Ar) as ambient gas. A Langmuir probe was used to collect the current from the plasma and from the current intensity, we calculate the electron density and electron temperature. The properties of Zn sputtering plasma at various discharge conditions were studied. At the RF power ranging from 20 to 100 W and gas pressure 5 mTorr, we found that the electron temperature was almost unchanged between 2-2.5 eV. On the other hand, the electron temperature increased drastically from 6 Multiplication-Sign 10{sup 9} to 1 Multiplication-Sign 10{sup 10}cm{sup -3} when the discharge gas pressure increased from 5 to 10 mTorr. The electron microscope images show that the grain size of Zn thin film increase when the discharge power is increased. This may be due to the enhancement of plasma density and sputtered Zn density.

  19. Electromagnetic surface waves for large-area RF plasma productions between large-area planar electrodes

    International Nuclear Information System (INIS)

    Nonaka, S.

    1992-01-01

    Recently, large-area plasma production has been tested by means of a 13.56 MHz radio-frequency (RF) discharge between a pair of large-area planar electrodes, approximately 0.5 m x 1.4 m, as one of the semiconductor technologies for fabrication of large-area amorphous silicon solar cells in the ''Sunshine Project'' of the Agency of Industrial Science and Technology in Japan. We also confirmed long plasma production between a pair of long electrodes. In this paper, normal electromagnetic (EM) waves propagating in a region between a planar waveguide with one plasma and two dielectric layers are analyzed in order to study the feasibility of large-area plasma productions by EM wave-discharges between a pair of large-area RF electrodes larger than the half-wavelength of RF wave. In conclusion, plasmas higher than an electron plasma frequency will be produced by an odd TMoo surface mode. (author) 4 refs., 3 figs

  20. Model polymer etching and surface modification by a time modulated RF plasma jet: role of atomic oxygen and water vapor

    Science.gov (United States)

    Luan, P.; Knoll, A. J.; Wang, H.; Kondeti, V. S. S. K.; Bruggeman, P. J.; Oehrlein, G. S.

    2017-01-01

    The surface interaction of a well-characterized time modulated radio frequency (RF) plasma jet with polystyrene, poly(methyl methacrylate) and poly(vinyl alcohol) as model polymers is investigated. The RF plasma jet shows fast polymer etching but mild chemical modification with a characteristic carbonate ester and NO formation on the etched surface. By varying the plasma treatment conditions including feed gas composition, environment gaseous composition, and treatment distance, we find that short lived species, especially atomic O for Ar/1% O2 and 1% air plasma and OH for Ar/1% H2O plasma, play an essential role for polymer etching. For O2 containing plasma, we find that atomic O initiates polymer etching and the etching depth mirrors the measured decay of O atoms in the gas phase as the nozzle-surface distance increases. The etching reaction probability of an O atom ranging from 10-4 to 10-3 is consistent with low pressure plasma research. We also find that adding O2 and H2O simultaneously into Ar feed gas quenches polymer etching compared to adding them separately which suggests the reduction of O and OH density in Ar/O2/H2O plasma.

  1. Characterization of gaseous species in scanning atmospheric rf plasma with transmission infrared spectroscopy

    International Nuclear Information System (INIS)

    Kim, Seong H.; Kim, Jeong Hoon; Kang, Bang-Kwon

    2008-01-01

    A scanning atmospheric radio-frequency (rf) plasma was analyzed with transmission infrared (IR) spectroscopy. The IR analyses were made for the plasmas used for hydrophobic coating deposition and superhydrophobic coating deposition processes. Since the rf plasma was generated in a small open space with a high gas flow rate in ambient air, the density of gas-phase molecules was very high and the plasma-generated reactive species seemed to undergo various reactions in the gas phase. So, the transmission IR spectra of the scanning atmospheric rf plasma were dominated by gas-phase reaction products, rather than plasma-generated intermediate species. In the CH 4 /He plasma used for hydrophobic coating deposition, C 2 H 6 , C 2 H 2 , and a small amount of C 2 H 4 as well as CO were detected in transmission IR. The intensities of these peaks increased as the rf power increased. The CO formation is due to the activation of oxygen and water in the air. In the CF 4 /H 2 /He plasma used for deposition of superhydrophobic coatings, C 2 F 6 , CF 3 H, COF 2 , and HF were mainly detected. When the H 2 /CF 4 ratio was ∼0.5, the consumption of CF 4 was the highest. As the H 2 /CF 4 ratio increased higher, the C 2 F 6 production was suppressed while the CF 3 H peak grew and the formation of CH 4 were detected. In both CH 4 /He and CF 4 /H 2 /He plasma systems, the undissociated feed gas molecules seem to be highly excited vibrationally and rotationally. The information on plasma-generated reactive species and their reactions was deduced from the distribution of these gas-phase reaction products

  2. Polyethylene Oxide Films Polymerized by Radio Frequency Plasma-Enhanced Chemical Vapour Phase Deposition and Its Adsorption Behaviour of Platelet-Rich Plasma

    International Nuclear Information System (INIS)

    Wen-Juan, Hu; Fen-Yan, Xie; Qiang, Chen; Jing, Weng

    2008-01-01

    We present polyethylene oxide (PEO) functional films polymerized by rf plasma-enhanced vapour chemical deposition (rf-PECVD) on p-Si (100) surface with precursor ethylene glycol dimethyl ether (EGDME) and diluted Ar in pulsed plasma mode. The influences of discharge parameters on the film properties and compounds are investigated. The film structure is analysed by Fourier transform infrared (FTIR) spectroscopy. The water contact angle measurement and atomic force microscope (AFM) are employed to examine the surface polarity and to detect surface morphology, respectively. It is concluded that the smaller duty cycle in pulsed plasma mode contributes to the rich C-O-C (EO) group on the surfaces. As an application, the adsorption behaviour of platelet-rich plasma on plasma polymerization films performed in-vitro is explored. The shapes of attached cells are studied in detail by an optic invert microscope, which clarifies that high-density C-O-C groups on surfaces are responsible for non-fouling adsorption behaviour of the PEO films

  3. Polyethylene Oxide Films Polymerized by Radio Frequency Plasma-Enhanced Chemical Vapour Phase Deposition and Its Adsorption Behaviour of Platelet-Rich Plasma

    Science.gov (United States)

    Hu, Wen-Juan; Xie, Fen-Yan; Chen, Qiang; Weng, Jing

    2008-10-01

    We present polyethylene oxide (PEO) functional films polymerized by rf plasma-enhanced vapour chemical deposition (rf-PECVD) on p-Si (100) surface with precursor ethylene glycol dimethyl ether (EGDME) and diluted Ar in pulsed plasma mode. The influences of discharge parameters on the film properties and compounds are investigated. The film structure is analysed by Fourier transform infrared (FTIR) spectroscopy. The water contact angle measurement and atomic force microscope (AFM) are employed to examine the surface polarity and to detect surface morphology, respectively. It is concluded that the smaller duty cycle in pulsed plasma mode contributes to the rich C-O-C (EO) group on the surfaces. As an application, the adsorption behaviour of platelet-rich plasma on plasma polymerization films performed in-vitro is explored. The shapes of attached cells are studied in detail by an optic invert microscope, which clarifies that high-density C-O-C groups on surfaces are responsible for non-fouling adsorption behaviour of the PEO films.

  4. Investigation of surface boundary conditions for continuum modeling of RF plasmas

    Science.gov (United States)

    Wilson, A.; Shotorban, B.

    2018-05-01

    This work was motivated by a lacking general consensus in the exact form of the boundary conditions (BCs) required on the solid surfaces for the continuum modeling of Radiofrequency (RF) plasmas. Various kinds of number and energy density BCs on solid surfaces were surveyed, and how they interacted with the electric potential BC to affect the plasma was examined in two fundamental RF plasma reactor configurations. A second-order local mean energy approximation with equations governing the electron and ion number densities and the electron energy density was used to model the plasmas. Zero densities and various combinations of drift, diffusion, and thermal fluxes were considered to set up BCs. It was shown that the choice of BC can have a significant impact on the sheath and bulk plasma. The thermal and diffusion fluxes to the surface were found to be important. A pure drift BC for dielectric walls failed to produce a sheath.

  5. The Efficiency of Quartz Particles Evaporation in the Argon Plasma Flow of the RF Inductively Coupled Plasma Torch

    Directory of Open Access Journals (Sweden)

    Yu. M. Grishin

    2017-01-01

    Full Text Available Owing to high-power density and high-purity plasma, a RF inductively coupled plasma torch (ICPT is widely used both in research laboratory and in industry. The potential RF ICPT application areas are powders spheroidisation, waste treatment, thermal spraying, etc.In the last decade the investigation was focused on the treatment processes of quartz into polycrystalline silicon. An analysis of these results has shown that the increasing productivity and producing high-purity silicon can be achieved only when using the electrodeless radio-frequency induction plasma torches and in case the optimum conditions for evaporation of SiO2solid particles are realized.Optimization of the RF ICPT design and power parameters calls for a wide range of computational studies. In spite of the fact that to date a large number of efforts to calculate the evaporation efficiency of powder materials have been made, a number of issues, as applied to the problem of obtaining silicon, require further research.In this paper, we present the results of a two-dimensional numerical simulation of the heating and evaporation of quartz particles in the RF ICPT channel with axial flow of gases. The main aim is to determine how the axial position of the central tube (through which the particles are injected into the discharge zone, the dispersion of the quartz powder, the amplitude of the discharge current (and, respectively, flow regimes impact on the evaporation efficiency of quartz particles.The paper presented the numerical modeling results of heating and evaporation processes of quartz particles supplied by transporting gas to the RF ICPT channel with axial gas flow (argon. Defined the impact of the axial position of the central tube, the plasma flow regime, the discharge current, the flow rate of transporting gas, and other parameters on the evaporation efficiency of quartz particles.It is shown that the evaporation efficiency of particles reaches its maximum when their

  6. Plasma diagnosis of RF discharge by using impedance measurement

    International Nuclear Information System (INIS)

    Huang Jianjun; Teuner, D.

    2001-01-01

    It is presented that the method known from network analysis with home-made probe and experimental setup to measure current, voltage and phase angle of RF discharge in He gas more accurately. The sheath thickness and the real and imaginary parts of the plasma impedance were obtained by using the equivalent circuit model and taking account stray capacitances of the set-up. In addition, making use of Godyak's RF discharge simple model, the electron density in the discharge was calculated at different pressure and current density

  7. Design aspects of 13.56MHz, 1kW, CW-RF oscillator for plasma production

    International Nuclear Information System (INIS)

    Kumar, Sunil; Kadia, Bhavesh; Singh, Raj; Varia, Atul; Srinivas, Y S S; Kulkarni, S V

    2010-01-01

    RF produced plasma has many applications in plasma processing and also it is useful in studying the fundamental characteristics of the plasma. A 1KW RF Hartley oscillator is designed and tested at 13.56 MHz. This has been built at RF section of Institute for Plasma Research by using EIMAC (3CX1200A7) triode tube. The RF source is operated in the grounded cathode mode. Triode 3CX1200A7 is operated in class AB and the feedback is Cathode grounded. The tube has sufficient margin in terms of plate dissipation and Grid dissipation that makes it suitable to withstand momentarily load mismatch. To optimize the RF source along with HVDC power supply many mechanical and electrical aspects have been thought of to enhance the overall quality of the system. This source mainly has three sections (The RF section, HVDC Power supply and soft start Filament Power supply). The system is compact and is housed in a 80 cm x 60 cm x 1800 cm aluminum panel. This paper describes the specifications, design criteria, circuit used, operating parameters of 1KW Oscillator along with HVDC power supply with necessary interlocks, tests conducted and results obtained of this 1 KW grounded grid Hartley Oscillator on 50 ohm dummy load. This system has been tested for 8 hours of continuous operation without any appreciable deterioration of the RF output power.

  8. Plasma diagnostics and device properties of AlGaN/GaN HEMT passivated with SiN deposited by plasma-enhanced chemical vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Romero, M F; Sanz, M M; Munoz, E [ISOM-Universidad Politecnica de Madrid (UPM). ETSIT, Madrid (Spain); Tanarro, I [Instituto de Estructura de la Materia, CSIC, Madrid (Spain); Jimenez, A, E-mail: itanarro@iem.cfmac.csic.e [Departamento Electronica, Escuela Politecnica Superior, Universidad de Alcala, Alcala de Henares, Madrid (Spain)

    2010-12-15

    In this work, silicon nitride thin films have been deposited by plasma enhanced chemical vapour deposition on both silicon samples and AlGaN/GaN high electron mobility transistors (HEMT) grown on sapphire substrates. Commercial parallel-plate RF plasma equipment has been used. During depositions, the dissociation rates of SiH{sub 4} and NH{sub 3} precursors and the formation of H{sub 2} and N{sub 2} have been analysed by mass spectrometry as a function of the NH{sub 3}/SiH{sub 4} flow ratio and the RF power applied to the plasma reactor. Afterwards, the properties of the films and the HEMT electrical characteristics have been studied. Plasma composition has been correlated with the SiN deposition rate, refractive index, H content and the final electric characteristics of the passivated transistors.

  9. Transition of RF internal antenna plasma by gas control

    Energy Technology Data Exchange (ETDEWEB)

    Hamajima, Takafumi; Yamauchi, Toshihiko; Kobayashi, Seiji; Hiruta, Toshihito; Kanno, Yoshinori [Advanced Institute of Industrial Technology, 1-10-40 HigashiOhi, Shinagawa-ku, Tokyo, 140-0011 (Japan); Japan Atomic Energy Agency, 2-4 Tokai-mura, Naka-gun, Ibaraki-ken, 319-1195 (Japan)

    2012-07-11

    The transition between the capacitively coupled plasma (CCP) and the inductively coupled plasma (ICP) was investigated with the internal radio frequency (RF) multi-turn antenna. The transition between them showed the hysteresis curve. The radiation power and the period of the self-pulse mode became small in proportion to the gas pressure. It was found that the ICP transition occurred by decreasing the gas pressure from 400 Pa.

  10. Hydrogen and helium trapping in tungsten deposition layers formed by RF plasma sputtering

    International Nuclear Information System (INIS)

    Kazunari Katayama; Kazumi Imaoka; Takayuki Okamura; Masabumi Nishikawa

    2006-01-01

    Understanding of tritium behavior in plasma facing materials is an important issue for fusion reactor from viewpoints of fuel control and radiation safety. Tungsten is used as a plasma facing material in the divertor region of ITER. However, investigation of hydrogen isotope behavior in tungsten deposition layer is not sufficient so far. It is also necessary to evaluate an effect of helium on a formation of deposition layer and an accumulation of hydrogen isotopes because helium generated by fusion reaction exists in fusion plasma. In this study, tungsten deposition layers were formed by sputtering method using hydrogen and helium RF plasma. An erosion rate and a deposition rate of tungsten were estimated by weight measurement. Hydrogen and helium retention were investigated by thermal desorption method. Tungsten deposition was performed using a capacitively-coupled RF plasma device equipped with parallel-plate electrodes. A tungsten target was mounted on one electrode which is supplied with RF power at 200 W. Tungsten substrates were mounted on the other electrode which is at ground potential. The plasma discharge was continued for 120 hours where pressure of hydrogen or helium was controlled to be 10 Pa. The amounts of hydrogen and helium released from deposition layers was quantified by a gas chromatograph. The erosion rate of target tungsten under helium plasma was estimated to be 1.8 times larger than that under hydrogen plasma. The deposition rate on tungsten substrate under helium plasma was estimated to be 4.1 times larger than that under hydrogen plasma. Atomic ratio of hydrogen to tungsten in a deposition layer formed by hydrogen plasma was estimated to be 0.17 by heating to 600 o C. From a deposition layer formed by helium plasma, not only helium but also hydrogen was released by heating to 500 o C. Atomic ratios of helium and hydrogen to tungsten were estimated to be 0.080 and 0.075, respectively. The trapped hydrogen is probably impurity hydrogen

  11. Fundamental aspects of plasma chemical physics kinetics

    CERN Document Server

    Capitelli, Mario; Colonna, Gianpiero; Esposito, Fabrizio; Gorse, Claudine; Hassouni, Khaled; Laricchiuta, Annarita; Longo, Savino

    2016-01-01

    Describing non-equilibrium "cold" plasmas through a chemical physics approach, this book uses the state-to-state plasma kinetics, which considers each internal state as a new species with its own cross sections. Extended atomic and molecular master equations are coupled with Boltzmann and Monte Carlo methods to solve the electron energy distribution function. Selected examples in different applied fields, such as microelectronics, fusion, and aerospace, are presented and discussed including the self-consistent kinetics in RF parallel plate reactors, the optimization of negative ion sources and the expansion of high enthalpy flows through nozzles of different geometries. The book will cover the main aspects of the state-to-state kinetic approach for the description of nonequilibrium cold plasmas, illustrating the more recent achievements in the development of kinetic models including the self-consistent coupling of master equations and Boltzmann equation for electron dynamics. To give a complete portrayal, the...

  12. Model polymer etching and surface modification by a time modulated RF plasma jet: role of atomic oxygen and water vapor

    International Nuclear Information System (INIS)

    Luan, P; Knoll, A J; Wang, H; Oehrlein, G S; Kondeti, V S S K; Bruggeman, P J

    2017-01-01

    The surface interaction of a well-characterized time modulated radio frequency (RF) plasma jet with polystyrene, poly(methyl methacrylate) and poly(vinyl alcohol) as model polymers is investigated. The RF plasma jet shows fast polymer etching but mild chemical modification with a characteristic carbonate ester and NO formation on the etched surface. By varying the plasma treatment conditions including feed gas composition, environment gaseous composition, and treatment distance, we find that short lived species, especially atomic O for Ar/1% O 2 and 1% air plasma and OH for Ar/1% H 2 O plasma, play an essential role for polymer etching. For O 2 containing plasma, we find that atomic O initiates polymer etching and the etching depth mirrors the measured decay of O atoms in the gas phase as the nozzle-surface distance increases. The etching reaction probability of an O atom ranging from 10 −4 to 10 −3 is consistent with low pressure plasma research. We also find that adding O 2 and H 2 O simultaneously into Ar feed gas quenches polymer etching compared to adding them separately which suggests the reduction of O and OH density in Ar/O 2 /H 2 O plasma. (letter)

  13. Advancement of In-Flight Alumina Powder Spheroidization Process with Water Droplet Injection Using a Small Power DC-RF Hybrid Plasma Flow System

    Science.gov (United States)

    Jang, Juyong; Takana, Hidemasa; Park, Sangkyu; Nishiyama, Hideya

    2012-09-01

    The correlation between plasma thermofluid characteristics and alumina powder spheroidization processes with water droplet injection using a small power DC-RF hybrid plasma flow system was experimentally clarified. Micro-sized water droplets with a low water flow rate were injected into the tail of thermal plasma flow so as not to disturb the plasma flow directly. Injected water droplets were vaporized in the thermal plasma flow and were transported upstream in the plasma flow to the torch by the backflow. After dissociation of water, the production of hydrogen was detected by the optical emission spectroscopy in the downstream RF plasma flow. The emission area of the DC plasma jet expanded and elongated in the vicinity of the RF coils. Additionally, the emission area of RF plasma flow enlarged and was visible as red emission in the downstream RF plasma flow in the vicinity below the RF coils due to hydrogen production. Therefore, the plasma flow mixed with produced hydrogen increased the plasma enthalpy and the highest spheroidization rate of 97% was obtained at a water flow rate of 15 Sm l/min and an atomizing gas flow rate of 8 S l/min using a small power DC-RF hybrid plasma flow system.

  14. Effects of rf power on electron density and temperature, neutral temperature, and Te fluctuations in an inductively coupled plasma

    International Nuclear Information System (INIS)

    Camparo, James; Fathi, Gilda

    2009-01-01

    Atomic clocks that fly on global-navigation satellites such as global positioning system (GPS) and Galileo employ light from low-temperature, inductively coupled plasmas (ICPs) for atomic signal generation and detection (i.e., alkali/noble-gas rf-discharge lamps). In this application, the performance of the atomic clock and the capabilities of the navigation system depend sensitively on the stability of the ICP's optical emission. In order to better understand the mechanisms that might lead to instability in these rf-discharge lamps, and hence the satellite atomic clocks, we studied the optical emission from a Rb/Xe ICP as a function of the rf power driving the plasma. Surprisingly, we found that the electron density in the plasma was essentially independent of increases in rf power above its nominal value (i.e., 'rf-power gain') and that the electron temperature was only a slowly varying function of rf-power gain. The primary effect of rf power was to increase the temperature of the neutrals in the plasma, which was manifested by an increase in Rb vapor density. Interestingly, we also found evidence for electron temperature fluctuations (i.e., fluctuations in the plasma's high-energy electron content). The variance of these fluctuations scaled inversely with the plasma's mean electron temperature and was consistent with a simple model that assumed that the total electron density in the discharge was independent of rf power. Taken as a whole, our results indicate that the electrons in alkali/noble-gas ICPs are little affected by slight changes in rf power and that the primary effect of such changes is to heat the plasma's neutral species.

  15. High plasma rotation velocity and density transitions by biased electrodes in RF produced, magnetized plasma

    International Nuclear Information System (INIS)

    Matsuyama, Shoichiro; Shinohara, Shunjiro

    2001-01-01

    A large density profile modification was successfully obtained by voltage biasing to electrodes inserted in a RF (radio frequency) produced, magnetized plasma, and formation of strong shear of azimuthal plasma rotation velocity in a supersonic regime was found. For the case of biasing to an electrode near the central plasma region, two types of density transitions were observed in the outer plasma region: one was an oscillatory transition between two states, and the other was a transition from high to low density states with a large reduction of density fluctuations. (author)

  16. High plasma rotation velocity and density transitions by biased electrodes in RF produced, magnetized plasma

    Energy Technology Data Exchange (ETDEWEB)

    Matsuyama, Shoichiro; Shinohara, Shunjiro [Kyushu Univ., Interdisciplinary Graduate School of Engineering Sciences, Fukuoka (Japan)

    2001-07-01

    A large density profile modification was successfully obtained by voltage biasing to electrodes inserted in a RF (radio frequency) produced, magnetized plasma, and formation of strong shear of azimuthal plasma rotation velocity in a supersonic regime was found. For the case of biasing to an electrode near the central plasma region, two types of density transitions were observed in the outer plasma region: one was an oscillatory transition between two states, and the other was a transition from high to low density states with a large reduction of density fluctuations. (author)

  17. Plasma processing of large curved surfaces for superconducting rf cavity modification

    Directory of Open Access Journals (Sweden)

    J. Upadhyay

    2014-12-01

    Full Text Available Plasma-based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF cavities. We have demonstrated surface layer removal in an asymmetric nonplanar geometry, using a simple cylindrical cavity. The etching rate is highly correlated with the shape of the inner electrode, radio-frequency (rf circuit elements, gas pressure, rf power, chlorine concentration in the Cl_{2}/Ar gas mixtures, residence time of reactive species, and temperature of the cavity. Using variable radius cylindrical electrodes, large-surface ring-shaped samples, and dc bias in the external circuit, we have measured substantial average etching rates and outlined the possibility of optimizing plasma properties with respect to maximum surface processing effect.

  18. Directional rf probe for measurement of conductivity of flowing plasmas

    International Nuclear Information System (INIS)

    Jayakumar, R.; Chakravarthy, D.P.; Rohatgi, V.K.

    1977-01-01

    An electrodeless immersible rf probe for measurement of plasma conductivity in the range 0.01 to 100 mho/m has been designed and fabricated. The probe, with an overall diameter of 11 mm, employs unidirectional electromagnetic field lines which reduce the inaccuracies caused by insertion of the probe in a flowing plasma. In the range studied the probe output shows a linear relationship with the conductivity of the medium. Such probes are of interest in the study of MHD and reentry plasmas

  19. RF-plasma interactions in the antenna near fields

    Energy Technology Data Exchange (ETDEWEB)

    Colestock, P.; Greene, G.J.; Hosea, J.C.; Phillips, C.K.; Stevens, J.E.; Ono, M.; Wilson, J.R. (Princeton Univ., NJ (USA). Plasma Physics Lab.); D' Ippolito, D.A.; Myra, J.R. (Lodestar Research Corp., Boulder, CO (USA)); Lehrman, I.S. (Grumman Aerospace Corp., Bethpage, NY (USA))

    1990-04-01

    An assessment is made of the various linear and nonlinear mechanisms that are likely to play a role in the near-field of Faraday shielded inductive antennas commonly used in ICRF heating experiments. A number of low-level, but potentially important, RF loss mechanisms have been proposed as candidates to explain the observed surface phenomena and impurity production associated with ICRF. These range from edge heating via linear processes, such as surface wave or Bernstein wave generation to a variety of nonlinear phenomena including parametric decay and RF-driven sheath effects. The various proposed mechanisms will be examined in this work in terms of the available experimental data and an evaluation will be made of the scaling of these phenomena to higher density and temperature plasmas. (orig.).

  20. Mechanism of laser and rf plasma in vibrational nonequilibrium CO-N2 gas mixture

    International Nuclear Information System (INIS)

    Lou Guofeng; Adamovich, Igor V.

    2009-01-01

    This paper investigates the mechanism of plasma created by focused CO laser and rf electric field. The plasma is created in a CO/N 2 environment, at a total pressure of 600 torr. Ionization of the gases occurs by an associative ionization mechanism, in collisions of two highly vibrationally excited molecules. These highly vibrationally excited states are populated by resonance absorption of the CO radiation followed by anharmonic vibration-vibration (V-V) pumping. Moreover N 2 also becomes vibrationally excited due to collisions with vibrationally excited CO. The coupled rf reduced electric field E/N is sufficiently low to prevent electron impact ionization that may create plasma individually, so when a subbreakdown rf field is applied to the plasma, collisions between the free electrons heated by the field and the diatomic species create additional vibrational excitation both in the region occupied by the CO laser beam and outside of the laser beam region. The numerical results show plasma created in both regions (in and out of the CO laser beam region) with the associative ionization mechanism. This suggests a method for creating a stable nonequilibrium plasma. The calculation result is verified by comparison the synthetic spectrum to a measured one.

  1. Development of the DC-RF Hybrid Plasma Source and the Application to the Etching and Texturing of the Silicon Surface

    International Nuclear Information System (INIS)

    Kim, Ji Hun

    2011-02-01

    Plasma used in dry etching, thin film deposition and surface treatment for display or semiconductor industries are operating at low pressures in general. However, low pressure processing is very costly due to the use of vacuum equipment and vacuum components. Subsequent wet processing is environmentally undesirable due to the use of a large amount of chemicals. Also, the usage of vacuum processing increases fabrication cost and decreases productivity. If stable atmospheric plasmas can be used, not only the decrease in processing costs but also the increase in productivity could be obtained. New DC arc plasmatron with a hot rod cathode and cold nozzle anode was developed and its V-A (Volt-Ampere) characteristics were investigated. Outlook of the measured V-A characteristics cleared the question of the stability of arc burning in the new DC arc plasmatron. The plasmatron that has a stable operations with distributed anode spot could possibly be applied to plasma chemical processing. And measured value of the erosion rate for copper anode is m Cu 3.6x10 -10 g/C which is better than corresponding data for thermo-ionic emission cathodes made of tungsten mw ∼10 -9 g/C. These facts mean that plasmatron durability reaches ∼10 3 h. The low anode erosion rate is related to the large surface of arc-anode contact due to distributed anode arc spot, which reduces the current density. Unique characteristics of the new plasma source concerning its durability and plasma purity at rather low temperatures make it an interesting tool for technical applications, such as etching/deposition and chemical reaction. To apply a plasma processing, the T-type plasmatron was modified to A-type. The A-type plasmatron was used to activate the CF 4 and SF 6 gases in etching experiments at atmospheric and low pressure. To reduce the recombination rate of the activated gas particles inside a plasmatron and let them preserve their activated state outside, the whole device was installed outside of

  2. Ion irradiation effects on ionic liquids interfaced with rf discharge plasmas

    International Nuclear Information System (INIS)

    Baba, K.; Kaneko, T.; Hatakeyama, R.

    2007-01-01

    The availability of plasma ion irradiation toward a gas-liquid interface is investigated in a rf discharge system incorporating an ionic liquid. The introduction of the ionic liquid to the plasma causes the formation of a sheath electric field on the ionic liquid surface, resulting in the acceleration of the ions to the ionic liquid and the generation of secondary electrons from the ionic liquid by the ion irradiation. These effects are found to advance the discharge process and enhance the plasma production

  3. Influence of ECR-RF plasma modification on surface and thermal properties of polyester copolymer

    Directory of Open Access Journals (Sweden)

    Fray Miroslawa El

    2015-12-01

    Full Text Available In this paper we report a study on influence of radio-frequency (RF plasma induced with electron cyclotron resonance (ECR on multiblock copolymer containing butylene terephthalate hard segments (PBT and butylene dilinoleate (BDLA soft segments. The changes in thermal properties were studied by DSC. The changes in wettability of PBT-BDLA surfaces were studied by water contact angle (WCA. We found that ECR-RF plasma surface treatment for 60 s led to decrease of WCA, while prolonged exposure of plasma led to increase of WCA after N2 and N2O2 treatment up to 70°–80°. The O2 reduced the WCA to 50°–56°. IR measurements confirmed that the N2O2 plasma led to formation of polar groups. SEM investigations showed that plasma treatment led to minor surfaces changes. Collectively, plasma treatment, especially O2, induced surface hydrophilicity what could be beneficial for increased cell adhesion in future biomedical applications of these materials.

  4. Design of a UHV-compatible rf plasma source and its application to self-assembled layers of CoPt3 nanoparticles

    International Nuclear Information System (INIS)

    Gehl, B.; Leist, U.; Aleksandrovic, V.; Nickut, P.; Zielasek, V.; Weller, H.; Al-Shamery, K.; Baeumer, M.

    2006-01-01

    A compact, versatile, and simple rf plasma source with capacitive coupling compatible to ultrahigh vacuum (UHV) requirements was designed and built to allow sequences of sample surface modification in plasma and surface preparation and analysis in vacuum without breaking the vacuum. The plasma source was operated at working pressures of less than 1 to a few millibars. Sample transfer to UHV was performed at pressures around 10 -9 mbar. For easy integration into an existing UHV setup, the sample recipient and transfer system were made to accept standard commercial sample holders. Preliminary experiments were performed by exposing monolayers of colloidal CoPt 3 nanoparticles to oxygen and hydrogen plasmas. The structural and chemical effects of the plasma treatments were analyzed with scanning electron microscopy and x-ray photoelectron spectroscopy

  5. RF plasma parameter determination by a Langmuir multipoint double probe array

    International Nuclear Information System (INIS)

    Rojas-Olmedo, I A; López-Callejas, R; De la Piedad-Beneitez, A; Valencia-Alvarado, R; Peña-Eguiluz, R; Mercado-Cabrera, A; Barocio, S R; Muñoz-Castro, A E; Rodríguez-Méndez, B G

    2012-01-01

    A multipoint double Langmuir (MDL) probe system, which is exempt from interference, has been designed and assembled to be applied to an RF plasma. The system provides the measurement of fundamental plasma parameters such as density, temperature, plasma potential, etc. on the basis of the Bohm Approximation Theory and the Orbital Movement Limit. Thus, one pair of the MDL system is selected so as to consider the right plasma parameters within the prevailing pressure-power intervals. Both the hardware and software of the system have been applied to the modification of material properties by means of the PIII process.

  6. RF generated currents in a magnetized plasma using a slow wave structure

    International Nuclear Information System (INIS)

    Poole, B.R.; Cheo, B.R.; Kuo, S.P.; Tang, M.G.

    1983-01-01

    The generation of a dc current in a plasma by using RF waves is of importance for the operation of steadystate toroidal devices. An experimental investigation in the use of unidirectional, low frequency RF waves to drive currents has been made. Instead of using a natural plasma wave a slow wave guiding structure is used along the entire length of the plasma. When the RF wave is injected an increase in ionization and T/sub e/, and hence the background current is observed. However, the change depends on wave direction: The +k/sub z/ excitation yields a much larger electron current compared with the -k/sub z/ excitation indicating a net wave driven current. The measured modification in electron density and T/sub e/ is independent of wave direction. The current with a standing wave excitation generally falls at the average of the travelling wave (+ or - k/sub z/) driven currents. The net wave driven current is proportional to the feed power at approx. = 10 mA/kW. No saturation of the current is observed with feed powers up to 1 kW. Since the exciting structure is only 1 wavelength long, its k/sub z/ spectrum is relatively broad and hence no sharp resonances are observed as various plasma parameters and B/sub O/ are changed. There is no measurable difference between the power absorbed by the load resistors and the input power to the slow wave structure. Thus the current is driven by the wave field exclamation E exclamation 2 rather than the power absorbed in the plasma. The theoretical background and the physical mechanism is presented

  7. Plasma Etching of superconducting radio frequency cavity by Ar/Cl2 capacitively coupled Plasma

    Science.gov (United States)

    Upadhyay, Janardan; Popovic, Svetozar; Valente-Feliciano, Anne-Marie; Phillips, Larry; Vuskovic, Lepsha

    2016-09-01

    We are developing plasma processing technology of superconducting radio frequency (SRF) cavities. The formation of dc self-biases due to surface area asymmetry in this type of plasma and its variation on the pressure, rf power and gas composition was measured. Enhancing the surface area of the inner electrode to reduce the asymmetry was studied by changing the contour of the inner electrode. The optimized contour of the electrode based on these measurements was chosen for SRF cavity processing. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity is used, which previously mechanically polished, buffer chemically etched afterwards and rf tested at cryogenic temperatures for a baseline test. Plasma processing was accomplished by moving axially the inner electrode and the gas flow inlet in a step-wise manner to establish segmented plasma processing. The cavity is rf tested afterwards at cryogenic temperatures. The rf test and surface condition results are presented.

  8. Time-resolved measurements of highly-polymerised negative ions in rf silane plasma deposition experiments

    International Nuclear Information System (INIS)

    Howling, A.A.; Sansonnens, L.; Dorier, J.L.; Hollenstein, C.

    1993-07-01

    The time-resolved fluxes of negative polysilicon hydride ions from a power-modulated rf silane plasma have been measured by quadrupole mass spectrometry and modeled using a simple polymerisation scheme. Experiments were performed with plasma parameters suitable for high-quality amorphous silicon deposition. Polysilicon hydride anions diffuse from the plasma with low energy (approximately 0.5 eV) during the afterglow after the electron density has decayed and the sheath fields have collapsed. The mass-dependence of the temporal behavior of the anion loss flux demonstrates that the plasma composition is influenced by the modulation frequency. The negative species attain much higher masses than the positive or neutral species, and anions containing as many as sixteen silicon atoms have been observed, corresponding to the 500 amu limit of the mass spectrometer. This suggests that negative ions could be the precursors to particle formation. Ion-molecule and ion-ion reactions are discussed and a simple negative ion polymerisation scheme is proposed which qualitatively reproduces the experimental results. The model shows that the densities of high mass negative ions in the plasma are strongly reduced by modulation frequencies near 1 kHz. Each plasma period is then too short for the polymerisation chain to propagate to high masses before the elementary anions are lost in each subsequent afterglow period. This explains why modulation of the rf power can reduce particle contamination. We conclude that, for the case of silane rf plasmas, the initiation steps which ultimately lead to particle contamination proceed by negative ion polymerisation. (author) 15 figs., 72 refs

  9. Plasma-enhanced chemical vapor deposited silicon oxynitride films for optical waveguide bridges for use in mechanical sensors

    DEFF Research Database (Denmark)

    Storgaard-Larsen, Torben; Leistiko, Otto

    1997-01-01

    In this paper the influence of RF power, ammonia flow, annealing temperature, and annealing time on the optical and mechanical properties of plasma-enhanced chemically vapor deposited silicon oxynitride films, is presented. A low refractive index (1.47 to 1.48) film having tensile stress has been...

  10. RF-heating and plasma confinement studies in HANBIT mirror device

    International Nuclear Information System (INIS)

    Kwon, M.; Bak, J.G.; Choh, K.K.

    2003-01-01

    HANBIT is a magnetic mirror confinement device. Recently, with almost finishing the first campaign for the basic system development, it started the second campaign for the high-temperature plasma confinement physics study in mirror configuration. Here, we introduce briefly the HANBIT device and report initial physics experiments results on RF-plasma heating and confinement in the simple mirror configuration. It appears that the discharge characteristics of HANBIT are quite different from those in other mirror devices, and an explanation is presented to clarify the difference. (author)

  11. Influence of DC arc jets on flow fields analyzed by an integrated numerical model for a DC-RF hybrid plasma

    International Nuclear Information System (INIS)

    Seo, Jun Ho; Park, Jin Myung; Hong, Sang Hee

    2008-01-01

    The influence of DC arc jets on the flow fields in a hybrid plasma torch is numerically analyzed by an integrated direct current-radio frequency (DC-RF) plasma model based on magneto-hydrodynamic formulations. The calculated results reveal that the increase in DC arc gas flow rate raises the axial flow velocity along the central column of the DC-RF hybrid plasma together with the enhanced backflow streams in the peripheral wall region. The temperature profiles on the torch exit plane are little affected due to the reheating process of the central column by the combined RF plasma. Accordingly, the exit enthalpy emitted from the DC-RF hybrid torch can be concentrated to the central column of the plasma and controlled by adjusting the DC arc gas flow rate. The swirl in the sheath gas flow turns out to have the opposite effect on the DC arc gas flow rate. The swirling motion of the sheath gas can reduce the back flows near the induction tube wall as well as the axial velocities in the central column of the plasma. Accordingly, the swirl in the sheath gas flow can be used for the functional operation of the DC-RF hybrid plasma along with the DC arc gas flow rate to suppress the back flows at the wall region and to reduce the excessive interactions between the DC arc jet and the ambient RF plasmas. The effects of DC input current on the flow fields of hybrid plasma are similar to those of the DC arc gas flow rate, but the axial velocities for the higher current relatively quickly decay along the centerline. This is in contrast to the increase in the axial velocity remaining in proportion to the increase in the DC arc gas flow rate all the way up to the exit of the DC-RF hybrid plasma. Accordingly, the present integrated numerical analysis suggests that the hybrid plasma field profiles and the entrainment of ambient air from the torch exit are controllable by adjusting the DC arc gas flow rate, the DC input current and swirl in the sheath gas flow taking advantage of

  12. RF-heating of plasma in the frequency domain of the ion cyclotron harmonics

    International Nuclear Information System (INIS)

    Hahnekamp, H.G.; Stampa, A.; Tuczek, H.; Laeuter, R.; Wulf, H.O.

    1976-01-01

    Experiments on rf-heating of plasmas in the frequency domain of the ion cyclotron harmonics are reported. The rf-power is coupled to the magneto-acoustic wave for frequencies between ωsub(ci) and 5ωsub(ci). The measurements indicate that the damping of the pump wave is mainly due to the excitation of turbulence, whereas direct resonance at 2ωsub(ci) seems to be of minor importance

  13. Development of localized arc filament RF plasma actuators for high-speed and high Reynolds number flow control

    International Nuclear Information System (INIS)

    Kim, J.-H.; Nishihara, M.; Adamovich, I.V.; Samimy, M.; Gorbatov, S.V.; Pliavaka, F.V.

    2010-01-01

    Recently developed localized arc filament plasma actuators (LAFPAs) have shown tremendous control authority in high-speed and high Reynolds number flow for mixing enhancement and noise mitigation. Previously, these actuators were powered by a high-voltage pulsed DC plasma generator with low energy coupling efficiency of 5-10%. In the present work, a new custom-designed 8-channel pulsed radio frequency (RF) plasma generator has been developed to power up to 8 plasma actuators operated over a wide range of forcing frequencies (up to 50 kHz) and duty cycles (1-50%), and at high energy coupling efficiency (up to 80-85%). This reduces input electrical power requirements by approximately an order of magnitude, down to 12 W per actuator operating at 10% duty cycle. The new pulsed RF plasma generator is scalable to a system with a large number of channels. Performance of pulsed RF plasma actuators used for flow control was studied in a Mach 0.9 circular jet with a Reynolds number of about 623,000 and compared with that of pulsed DC actuators. Eight actuators were distributed uniformly on the perimeter of a 2.54-cm diameter circular nozzle extension. Both types of actuators coupled approximately the same amount of power to the flow, but with drastically different electrical inputs to the power supplies. Particle image velocimetry measurements showed that jet centerline Mach number decay produced by DC and RF actuators operating at the same forcing frequencies and duty cycles is very similar. At a forcing Strouhal number near 0.3, close to the jet column instability frequency, well-organized periodic structures, with similar patterns and dimensions, were generated in the jets forced by both DC and RF actuators. Far-field acoustic measurements demonstrated similar trends in the overall sound pressure level (OASPL) change produced by both types of actuators, resulting in OASPL reduction up to 1.2-1.5 dB in both cases. We conclude that pulsed RF actuators demonstrate flow

  14. Gravimetrical and chemical characterization of SiOx structures deposited on fine powders by short plasma exposure in a plasma down stream reactor

    International Nuclear Information System (INIS)

    Spillmann, Adrian; Sonnenfeld, Axel; Rohr, Philipp Rudolf von

    2008-01-01

    The surface of lactose particles was modified by a plasma-enhanced chemical vapor deposition process to improve the flow behavior of the powder. For this, the particulates were treated in a plasma down stream reactor which provides a short (50 ms) and homogeneous exposure to the capacitively coupled RF discharge. The organosilicon monomer hexamethyldisiloxane (HMDSO) was used as a precursor for the formation of SiO x which is deposited on the substrate particle surface. For varying process gas mixtures (O 2 /Ar/HMDSO) and RF power applied, the amount of the deposited material was determined gravimetrically after dissolution of the lactose substrate particles and the chemical composition of the accumulated deposition material was investigated by means of attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy. The concentration of the deposited SiO x relating to the substrate material was found to be in the range of 0.1 wt.%. Based on the ATR-FTIR analysis, the inorganic, i.e. oxidic SiO x fraction of the obtained deposits was shown to be controllable by varying the process parameters, whilst a relatively large amount of organic structures must be considered.

  15. RF generator interlock by plasma grid bias current - An alternate to Hα interlock

    Science.gov (United States)

    Bandyopadhyay, M.; Gahlaut, A.; Yadav, R. K.; Pandya, K.; Tyagi, H.; Vupugalla, M.; Bhuyan, M.; Bhagora, J.; Chakraborty, A.

    2017-08-01

    ROBIN is inductively coupled plasma (ICP) based negative hydrogen ion source, operated with a 100kW, 1MHz Tetrode based RF generator (RFG). Inductive plasma ignition by the RFG in ROBIN is associated with electron seeding by a hot filament and a gas puff. RFG is triggered by the control system to deliver power just at the peak pressure of the gas puff. Once plasma is ignited due to proper impedance matching, a bright light, dominated by Hα (˜656nm wavelength) radiation is available inside RF driver which is used as a feedback signal to the RFG to continue its operation. If impedance matching is not correct, plasma is not produced due to lack of power coupling and bright light is not available. During such condition, reflected RF power may damage the RFG. Therefore, to protect the RFG, it needs to be switched off automatically within 200ms by the control system in such cases. This plasma light based RFG interlock is adopted from BATMAN ion source. However, in case of vacuum immersed RF ion source in reactor grade NBI system, such plasma light based interlock may not be feasible due to lack of adequate optical fiber interfaces. In reactor grade NBI system, neutron and gamma radiations have impact on materials which may lead to frequent maintenance and machine down time. The present demonstration of RFG interlock by Bias Current (BC) in ROBIN testbed gives an alternate option in this regard. In ROBIN, a bias plate (BP) is placed in the plasma chamber near the plasma grid (PG). BP is electrically connected to the plasma chamber wall of the ion source and PG is isolated from the wall. A high current ˜85 A direct current (DC) power supply of voltage in the range of 0 - 33V is connected between the PG and the BP in such a way that PG can be biased positively with respect to the BP or plasma chamber. This arrangement is actually made to absorb electrons and correspondingly reduce co-extracted electron current during beam extraction. However, in case of normal plasma

  16. RF power absorption by plasma of low pressure low power inductive discharge located in the external magnetic field

    Science.gov (United States)

    Kralkina, E. A.; Rukhadze, A. A.; Nekliudova, P. A.; Pavlov, V. B.; Petrov, A. K.; Vavilin, K. V.

    2018-03-01

    Present paper is aimed to reveal experimentally and theoretically the influence of magnetic field strength, antenna shape, pressure, operating frequency and geometrical size of plasma sources on the ability of plasma to absorb the RF power characterized by the equivalent plasma resistance for the case of low pressure RF inductive discharge located in the external magnetic field. The distinguishing feature of the present paper is the consideration of the antennas that generate not only current but charge on the external surface of plasma sources. It is shown that in the limited plasma source two linked waves can be excited. In case of antennas generating only azimuthal current the waves can be attributed as helicon and TG waves. In the case of an antenna with the longitudinal current there is a surface charge on the side surface of the plasma source, which gives rise to a significant increase of the longitudinal and radial components of the RF electric field as compared with the case of the azimuthal antenna current.

  17. Gas and plasma dynamics of RF discharge jet of low pressure in a vacuum chamber with flat electrodes and inside tube, influence of RF discharge on the steel surface parameters

    Science.gov (United States)

    Khristoliubova, V. I.; Kashapov, N. F.; Shaekhov, M. F.

    2016-06-01

    Researches results of the characteristics of the RF discharge jet of low pressure and the discharge influence on the surface modification of high speed and structural steels are introduced in the article. Gas dynamics, power and energy parameters of the RF low pressure discharge flow in the discharge chamber and the electrode gap are studied in the presence of the materials. Plasma flow rate, discharge power, the concentration of electrons, the density of RF power, the ion current density, and the energy of the ions bombarding the surface materials are considered for the definition of basic properties crucial for the process of surface modification of materials as they were put in the plasma jet. The influence of the workpiece and effect of products complex configuration on the RF discharge jet of low pressure is defined. The correlation of the input parameters of the plasma unit on the characteristics of the discharge is established.

  18. Simulation of spatially dependent excitation rates and power deposition in RF discharges for plasma processing

    International Nuclear Information System (INIS)

    Kushner, M.J.; Anderson, H.M.; Hargis, P.J.

    1985-01-01

    In low pressure, radio frequency (RF) discharges of the type used in plasma processing of semiconductor materials, the rate of electron impact excitation and energy transfer processes depends upon both the phase of the RF excitation and position in the discharge. Electron impact collisions create radicals that diffuse or drift to the surfaces of interest where they are adsorbed or otherwise react. To the extent that these radicals have a finite lifetime, their transport time from point of creation to surface of interest is an important parameter. The spatial dependence of the rate of the initial electron impact collisions is therefore also an important parameter. The power that sustains the discharge is coupled into the system by two mechanisms: a high energy e-beam component of the electron distribution resulting from electrons falling through or being accelerated by the sheaths, and by joule heating in the body of the plasma. In this paper, the authors discuss the spatial dependence of excitation rates and the method of power deposition iin RF discharges of the type used for plasma processing

  19. RF plasma source for heavy ion beam charge neutralization

    International Nuclear Information System (INIS)

    Efthimion, Philip C.; Gilson, Erik; Grisham, Larry; Davidson, Ronald C.; Yu, Simon S.; Logan, B. Grant

    2003-01-01

    Highly ionized plasmas are being used as a medium for charge neutralizing heavy ion beams in order to focus the ion beam to a small spot size. A radio frequency (RF) plasma source has been built at the Princeton Plasma Physics Laboratory (PPPL) in support of the joint Neutralized Transport Experiment (NTX) at the Lawrence Berkeley National Laboratory (LBNL) to study ion beam neutralization with plasma. The goal is to operate the source at pressures ∼ 10 -5 Torr at full ionization. The initial operation of the source has been at pressures of 10 -4 -10 -1 Torr and electron densities in the range of 10 8 -10 11 cm -3 . Recently, pulsed operation of the source has enabled operation at pressures in the 10 -6 Torr range with densities of 10 11 cm -3 . Near 100% ionization has been achieved. The source has been integrated with the NTX facility and experiments have begun

  20. Application of epifluorescence scanning for monitoring the efficacy of protein removal by RF gas-plasma decontamination

    Energy Technology Data Exchange (ETDEWEB)

    Baxter, Helen C; Richardson, Patricia R; Campbell, Gaynor A; Jones, Anita C; Baxter, Robert L [School of Chemistry, Joseph Black Chemistry Building, University of Edinburgh, West Mains Road, Edinburgh EH9 3JJ (United Kingdom); Kovalev, Valeri I; Maier, Robert; Barton, James S [School of Engineering and Physical Science, Heriot-Watt University, Edinburgh EH14 4AS (United Kingdom); DeLarge, Greg [Plasma Etch Inc, 3522 Arrowhead Drive, Carson City, NV 89706 (United States); Casey, Mark [Sterile Services Department, Royal Infirmary of Edinburgh, Edinburgh EH16 4AS (United Kingdom)], E-mail: r.baxter@ed.ac.uk

    2009-11-15

    The development of methods for measuring the efficiency of gas-plasma decontamination has lagged far behind application. An approach to measuring the efficiency of protein removal from solid surfaces using fluorescein-labelled bovine serum albumin and epifluorescence scanning (EFSCAN) is described. A method for fluorescently labelling proteins, which are adsorbed and denatured on metal surfaces, has been developed. Both approaches have been used to evaluate the efficiency of radio frequency (RF) gas-plasma decontamination protocols. Examples with 'real' surgical instruments demonstrate that an argon-oxygen RF gas-plasma treatment can routinely reduce the protein load by about three orders of magnitude beyond that achieved by current decontamination methods.

  1. Application of epifluorescence scanning for monitoring the efficacy of protein removal by RF gas-plasma decontamination

    International Nuclear Information System (INIS)

    Baxter, Helen C; Richardson, Patricia R; Campbell, Gaynor A; Jones, Anita C; Baxter, Robert L; Kovalev, Valeri I; Maier, Robert; Barton, James S; DeLarge, Greg; Casey, Mark

    2009-01-01

    The development of methods for measuring the efficiency of gas-plasma decontamination has lagged far behind application. An approach to measuring the efficiency of protein removal from solid surfaces using fluorescein-labelled bovine serum albumin and epifluorescence scanning (EFSCAN) is described. A method for fluorescently labelling proteins, which are adsorbed and denatured on metal surfaces, has been developed. Both approaches have been used to evaluate the efficiency of radio frequency (RF) gas-plasma decontamination protocols. Examples with 'real' surgical instruments demonstrate that an argon-oxygen RF gas-plasma treatment can routinely reduce the protein load by about three orders of magnitude beyond that achieved by current decontamination methods.

  2. Buffer Chemical Polishing and RF Testing of the 56 MHz SRF Cavity

    Energy Technology Data Exchange (ETDEWEB)

    Burrill,A.

    2009-01-01

    The 56 MHz cavity presents a unique challenge in preparing it for RF testing prior to construction of the cryomodule. This challenge arises due to the physical dimensions and subsequent weight of the cavity, and is further complicated by the coaxial geometry, and the need to properly chemically etch and high pressure rinse the entire inner surface prior to RF testing. To the best of my knowledge, this is the largest all niobium SRF cavity to be chemically etched and subsequently tested in a vertical dewar at 4K, and these processes will be the topic of this technical note.

  3. Chemical derivation to enhance the chemical/oxidative stability of resorcinol-formaldehyde (R-F) resin

    International Nuclear Information System (INIS)

    Hubler, T.L.; Shaw, W.J.; Brown, G.N.; Linehan, J.C.; Franz, J.A.; Hart, T.R.; Hogan, M.O.

    1996-09-01

    Tank wastes at Hanford and SRS contain highly alkaline supernate solutions of conc. Na, K nitrates with large amounts of 137 Cs. It is desirable to remove and concentrate the highly radioactive fraction for vitrification. One candidate ion exchange material for removing the radiocesium is R-F resin. This report summarizes studies into synthesis and characterization of 4-derivatized R-F resins prepared in pursuit of more chemically/oxidatively robust resin. 85% 4-fluororesorcinol/15% phenol formaldehyde resin appears to have good stability in alkaline solution, although there may be some nucleophilic displacement reaction during synthesis; further studies are needed

  4. Diagnostics of an rf induction plasma torch with the aid of a magnetic probe

    International Nuclear Information System (INIS)

    Shamim, A.; Wooding, E.R.

    1978-01-01

    Estimates of a plasma temperature, electrical conductivity, and torch efficiency have been made from simple measurements made on the plasma and on the rf supply. Measurements were made with the aid of a simple magnetic probe and a pickup coil. Estimates are also made of the heating-coil constants

  5. Simulation of plasma loading of high-pressure RF cavities

    Energy Technology Data Exchange (ETDEWEB)

    Yu, K. [Brookhaven National Lab. (BNL), Upton, NY (United States). Computational Science Initiative; Samulyak, R. [Brookhaven National Lab. (BNL), Upton, NY (United States). Computational Science Initiative; Stony Brook Univ., NY (United States). Dept. of Applied Mathematics and Statistics; Yonehara, K. [Fermi National Accelerator Lab. (FNAL), Batavia, IL (United States); Freemire, B. [Northern Illinois Univ., DeKalb, IL (United States)

    2018-01-11

    Muon beam-induced plasma loading of radio-frequency (RF) cavities filled with high pressure hydrogen gas with 1% dry air dopant has been studied via numerical simulations. The electromagnetic code SPACE, that resolves relevant atomic physics processes, including ionization by the muon beam, electron attachment to dopant molecules, and electron-ion and ion-ion recombination, has been used. Simulations studies have also been performed in the range of parameters typical for practical muon cooling channels.

  6. Simulation of plasma loading of high-pressure RF cavities

    Science.gov (United States)

    Yu, K.; Samulyak, R.; Yonehara, K.; Freemire, B.

    2018-01-01

    Muon beam-induced plasma loading of radio-frequency (RF) cavities filled with high pressure hydrogen gas with 1% dry air dopant has been studied via numerical simulations. The electromagnetic code SPACE, that resolves relevant atomic physics processes, including ionization by the muon beam, electron attachment to dopant molecules, and electron-ion and ion-ion recombination, has been used. Simulations studies have been performed in the range of parameters typical for practical muon cooling channels.

  7. Direct visual observation of powder dynamics in RF plasma-assisted deposition

    International Nuclear Information System (INIS)

    Howling, A.A.; Hollenstein, C.; Paris, P.J.

    1991-04-01

    Contamination due to particles generated and suspended in silane rf plasmas is investigated. Powder is rendered visible by illumination of the reactor volume. This simple diagnostic for global, spatio-temporal powder dynamics is used to study particle formation, trapping and powder reduction by power modulation. (author) 4 figs., 11 refs

  8. RF atmospheric plasma jet surface treatment of paper

    Science.gov (United States)

    Pawlat, Joanna; Terebun, Piotr; Kwiatkowski, Michał; Diatczyk, Jaroslaw

    2016-09-01

    A radio frequency RF atmospheric pressure plasma jet was used to enhance the wettability of cellulose-based paper of 90 g m-2 and 160 g m-2 grammage as a perspective platform for antibiotic sensitivity tests. Helium and argon were the carrier gases for oxygen and nitrogen; pure water and rapeseed oil were used for goniometric tests. The influence of the flow rate and gas type, the power of the discharge, and distance from the nozzle was examined. The surface structure was observed using an optical microscope. Attenuated total reflection Fourier transform infrared (ATR-FTIR) spectra were investigated in order to determine whether cellulose degradation processes occurred. The RF plasma jet allowed us to decrease the surface contact angle without drastic changes in other features of the tested material. Experiments confirmed the significant influence of the distance between the treated sample and reactor nozzle, especially for treatment times longer than 15 s due to the greater concentration of reactive species at the surface of the sample, which decreases with distance—and their accumulation effect with time. The increase of discharge power plays an important role in decreasing the surface contact angle for times longer than 10 s. Higher power had a positive effect on the amount of generated active particles and facilitated the ignition of discharge. However, a too high value can cause a rise in temperature of the material and heat-caused damage.

  9. Titanium oxidation by rf inductively coupled plasma

    International Nuclear Information System (INIS)

    Valencia-Alvarado, R; López-Callejas, R; Barocio, S R; Mercado-Cabrera, A; Peña-Eguiluz, R; Muñoz-Castro, A E; Rodríguez-Méndez, B G; De la Piedad-Beneitez, A; De la Rosa-Vázquez, J M

    2014-01-01

    The development of titanium dioxide (TiO 2 ) films in the rutile and anatase phases is reported. The films have been obtained from an implantation/diffusion and sputtering process of commercially pure titanium targets, carried out in up to 500 W plasmas. The experimental outcome is of particular interest, in the case of anatase, for atmospheric pollution degradation by photocatalysis and, as to the rutile phase, for the production of biomaterials required by prosthesis and implants. The reactor employed consists in a cylindrical pyrex-like glass vessel inductively coupled to a 13.56 MHz RF source. The process takes place at a 5×10 −2 mbar pressure with the target samples being biased from 0 to -3000 V DC. The anatase phase films were obtained from sputtering the titanium targets over glass and silicon electrically floated substrates placed 2 cm away from the target. The rutile phase was obtained by implantation/diffusion on targets at about 700 °C. The plasma was developed from a 4:1 argon/oxygen mixture for ∼5 hour processing periods. The target temperature was controlled by means of the bias voltage and the plasma source power. The obtained anatase phases did not require annealing after the plasma oxidation process. The characterization of the film samples was conducted by means of x-ray diffraction, scanning electron microscopy, x-ray photoelectron spectroscopy and Raman spectroscopy

  10. Aging and its circumvention in rf-plasma oxidized Pb-alloy Josephson junctions

    International Nuclear Information System (INIS)

    Wada, M.; Nakano, J.

    1987-01-01

    The aging phenomenon of Pb-alloy Josephson junctions is investigated and an effective method of circumventing it is presented. Junctions consist of Pb-alloy electrodes and a tunneling barrier formed by rf-plasma oxidation of the Pb-alloy. First, aging and annealing-driven change in normal tunneling resistance are compared to verify the usage of annealing as an experimental method for simulation and acceleration of aging. Next, process variables affecting the annealing change in junction characteristics are examined and their influence is described. The importance of the oxide-base electrode interface is confirmed and that of the counterelectrode-oxide interface is experimentally shown. Furthermore, possible changes in the oxide itself are discussed. Finally, on the basis of these studies, rf-plasma oxidation in a CO 2 atmosphere is employed and proven to be an effective method for circumventing the annealing change in the junction characteristics

  11. RF plasma nitriding of severely deformed iron-based alloys

    International Nuclear Information System (INIS)

    Ferkel, H.; Glatzer, M.; Estrin, Y.; Valiev, R.Z.; Blawert, C.; Mordike, B.L.

    2003-01-01

    The effect of severe plastic deformation by cold high pressure torsion (HPT) on radio frequency (RF) plasma nitriding of pure iron, as well as St2K50 and X5CrNi1810 steels was investigated. Nitriding was carried out for 3 h in a nitrogen atmosphere at a pressure of 10 -5 bar and temperatures of 350 and 400 deg. C. Nitrided specimens were analysed by scanning electron microscopy (SEM), X-ray diffraction and micro hardness measurements. It was found that HPT enhances the effect of nitriding leading almost to doubling of the thickness of the nitrided layer for pure iron and the high alloyed steel. The largest increase in hardness was observed when HPT was combined with RF plasma nitriding at 350 deg. C. In the case of pure iron, the X-ray diffraction spectra showed the formation of ε and γ' nitrides in the compound layer, with a preferential formation of γ' at the expense of the α-phase at the higher nitriding temperature. The corresponding surface hardness was up to 950 HV0.01. While the HPT-processed St2K50 exhibits both nitride phases after nitriding at 350 deg. C, only the γ'-phase was observed after nitriding at 400 deg. C. A surface hardness of up to 1050 HV0.01 was measured for this steel. The high alloyed steel X5CrNi1810 exhibited the highest increase in surface hardness when HPT was combined with nitriding at 350 deg. C. The surface hardness of this steel was greater than 1400 HV0.025. The XRD analyses indicate the formation of the expanded austenite (S-phase) in the surface layer as a result of RF plasma nitriding. Furthermore, after HPT X5CrNi1810 was transformed completely into deformation martensite which did not transform back to austenite under thermochemical treatment. However, in the case of nitriding of the HPT-processed high alloyed steel at 400 deg. C, the formation of the S-phase was less pronounced. In view of the observed XRD peak broadening, the formation of nitrides, such as e.g. CrN, cannot be ruled out

  12. Simulation of rarefied low pressure RF plasma flow around the sample

    Science.gov (United States)

    Zheltukhin, V. S.; Shemakhin, A. Yu

    2017-01-01

    The paper describes a mathematical model of the flow of radio frequency plasma at low pressure. The hybrid mathematical model includes the Boltzmann equation for the neutral component of the RF plasma, the continuity and the thermal equations for the charged component. Initial and boundary conditions for the corresponding equations are described. The electron temperature in the calculations is 1-4 eV, atoms temperature in the plasma clot is (3-4) • 103 K, in the plasma jet is (3.2-10) • 102 K, the degree of ionization is 10-7-10-5, electron density is 1015-1019 m-3. For calculations plasma parameters is developed soft package on C++ program language, that uses the OpenFOAM library package. Simulations for the vacuum chamber in the presence of a sample and the free jet flow were carried out.

  13. Nonlinear plasma experiments in geospace with gigawatts of RF power at HAARP

    Energy Technology Data Exchange (ETDEWEB)

    Sheerin, J. P., E-mail: jsheerin@emich.edu [Physics and Astronomy, Eastern Michigan Univ., Ypsilanti, MI 48197 (United States); Cohen, Morris B., E-mail: mcohen@gatech.edu [Electrical and Computer Engineering, Georgia Tech, Atlanta, GA 30332-0250 (United States)

    2015-12-10

    The ionosphere is the ionized uppermost layer of our atmosphere (from 70 – 500 km altitude) where free electron densities yield peak critical frequencies in the HF (3 – 30 MHz) range. The ionosphere thus provides a quiescent plasma target, stable on timescales of minutes, for a whole host of active plasma experiments. High power RF experiments on ionospheric plasma conducted in the U.S. have been reported since 1970. The largest HF transmitter built to date is the HAARP phased-array HF transmitter near Gakona, Alaska which can deliver up to 3.6 Gigawatts (ERP) of CW RF power in the range of 2.8 – 10 MHz to the ionosphere with microsecond pointing, power modulation, and frequency agility. With an ionospheric background thermal energy in the range of only 0.1 eV, this amount of power gives access to the highest regimes of the nonlinearity (RF intensity to thermal pressure) ratio. HAARP’s unique features have enabled the conduct of a number of unique nonlinear plasma experiments in the interaction region of overdense ionospheric plasma including generation of artificial aurorae, artificial ionization layers, VLF wave-particle interactions in the magnetosphere, parametric instabilities, stimulated electromagnetic emissions (SEE), strong Langmuir turbulence (SLT) and suprathermal electron acceleration. Diagnostics include the Modular UHF Ionospheric Radar (MUIR) sited at HAARP, the SuperDARN-Kodiak HF radar, spacecraft radio beacons, HF receivers to record stimulated electromagnetic emissions (SEE) and telescopes and cameras for optical emissions. We report on short timescale ponderomotive overshoot effects, artificial field-aligned irregularities (AFAI), the aspect angle dependence of the intensity of the HF-enhanced plasma line, and production of suprathermal electrons. One of the primary missions of HAARP, has been the generation of ELF (300 – 3000 Hz) and VLF (3 – 30 kHz) radio waves which are guided to global distances in the Earth

  14. Patterned growth of carbon nanotubes obtained by high density plasma chemical vapor deposition

    Science.gov (United States)

    Mousinho, A. P.; Mansano, R. D.

    2015-03-01

    Patterned growth of carbon nanotubes by chemical vapor deposition represents an assembly approach to place and orient nanotubes at a stage as early as when they are synthesized. In this work, the carbon nanotubes were obtained at room temperature by High Density Plasmas Chemical Vapor Deposition (HDPCVD) system. This CVD system uses a new concept of plasma generation, where a planar coil coupled to an RF system for plasma generation was used with an electrostatic shield for plasma densification. In this mode, high density plasmas are obtained. We also report the patterned growth of carbon nanotubes on full 4-in Si wafers, using pure methane plasmas and iron as precursor material (seed). Photolithography processes were used to pattern the regions on the silicon wafers. The carbon nanotubes were characterized by micro-Raman spectroscopy, the spectra showed very single-walled carbon nanotubes axial vibration modes around 1590 cm-1 and radial breathing modes (RBM) around 120-400 cm-1, confirming that high quality of the carbon nanotubes obtained in this work. The carbon nanotubes were analyzed by atomic force microscopy and scanning electron microscopy too. The results showed that is possible obtain high-aligned carbon nanotubes with patterned growth on a silicon wafer with high reproducibility and control.

  15. Application of capacitively coupled rf discharge plasma for sterilization of polymer materials used in ophthalmology

    International Nuclear Information System (INIS)

    Abdullin, I.Sh.; Avetisov, S.E.; Lipatov, D.V.; Rybakova, E.G.; Bragin, V.E.; Bykanov, A.N.; Kamarentsev, E.N.

    1996-01-01

    The sterilization effect of capacitively coupled rf discharge plasma treatment of contact lenses was investigated. There were used two types of polymer: highly hydrophilic polymer with water content 76% (Navelen-76) and poly-methylmethacrylate (PMMA). There was demonstrated the possibility of effective sterilization by RF discharge plasma of a set of polymer materials used in ophthalmology. The best results were obtained for hard contact lenses. There was perfect sterilization in this case. There were not perfect sterilization in some cases of soft contact lenses treatment. It may be caused by porous structure of the external layers of this material and limited thickness of the sterilization layer. (author)

  16. Spatio-temporal evolution of the dust particle size distribution in dusty argon rf plasmas

    International Nuclear Information System (INIS)

    Killer, Carsten; Mulsow, Matthias; Melzer, André

    2015-01-01

    An imaging Mie scattering technique has been developed to measure the spatially resolved size distribution of dust particles in extended dust clouds. For large dust clouds of micrometre-sized plastic particles confined in an radio frequency (rf) discharge, a segmentation of the dust cloud into populations of different sizes is observed, even though the size differences are very small. The dust size dispersion inside a population is much smaller than the difference between the populations. Furthermore, the dust size is found to be constantly decreasing over time while the particles are confined in an inert argon plasma. The processes responsible for the shrinking of the dust in the plasma have been addressed by mass spectrometry, ex situ microscopy of the dust size, dust resonance measurements, in situ determination of the dust surface temperature and Fourier transform infrared absorption (FT-IR). It is concluded that both a reduction of dust size and its mass density due to outgassing of water and other volatile constituents as well as chemical etching by oxygen impurities are responsible for the observations. (paper)

  17. RF plasma deposition of thin SixGeyCz:H films using a combination of organometallic source materials

    International Nuclear Information System (INIS)

    Rapiejko, C.; Gazicki-Lipman, M.; Klimek, L.; Szymanowski, H.; Strojek, M.

    2004-01-01

    Elements of the IV group of periodic table have been strongly present in the fast development of PECVD techniques for the last two decades at least. As a result, deposition technologies of such materials as a-Si:H, a-C:H, mμ-C:H or DLC have been successfully established. What has followed is an ever growing interest in binary systems of the A x (IV)B y (IV):H kind. One possible way to deposit such systems is to use organosilicon compounds (to deposit Si x C y :H films) or organogermanium compounds (to deposit Ge x C y :H films), as source substances. The present paper reports on a RF plasma deposition of a Si x Ge y C z :H ternary system, using a combination of organosilicon and organogermanium compounds. Thin Si/Ge/C films have been fabricated in a small volume (ca. 2 dm 3 ) parallel plate RF plasma reactor using, as a source material, a combination of tetramethylsilane (TMS) and tetramethylgermanium (TMG) vapours carried by argon. SEM investigations reveal a continuous compact character of the coatings and their uniform thickness. The elemental composition of the films has been studied using EDX analysis. The results of the analysis show that the elemental composition of the films can be controlled by both the TMG/TMS ratio of the initial mixture and the RF power input. Ellipsometric measurements show good homogeneity of these materials. Chemical bonding in the films has been studied using the FTIR technique. Bandgap calculations have been carried out using ellipsometric data and by applying both the Tauc law and the Moss approach

  18. Removal of carbon contaminations by RF plasma generated reactive species and subsequent effects on optical surface

    Energy Technology Data Exchange (ETDEWEB)

    Yadav, P. K., E-mail: praveenyadav@rrcat.gov.in; Rai, S. K.; Modi, M. H.; Nayak, M.; Lodha, G. S. [Indus Synchrotron Utilization Division, Raja Ramanna Centre for Advanced Technology, Indore-452013 (India); Kumar, M.; Chakera, J. A.; Naik, P. A. [Laser Plasma Laboratory, Laser Plasma Division, Raja Ramanna Centre for Advanced Technology, Indore-452013 (India)

    2015-06-24

    Carbon contamination on optical elements is a serious issue in synchrotron beam lines for several decades. The basic mechanism of carbon deposition on optics and cleaning strategies are not fully understood. Carbon growth mechanism and optimized cleaning procedures are worldwide under development stage. Optimized RF plasma cleaning is considered an active remedy for the same. In present study carbon contaminated optical test surfaces (carbon capped tungsten thin film) are exposed for 30 minutes to four different gases, rf plasma at constant power and constant dynamic pressure. Structural characterization (thickness, roughness and density) of virgin samples and plasma exposed samples was done by soft x-ray (λ=80 Å) reflectivity measurements at Indus-1 reflectivity beam line. Different gas plasma removes carbon with different rate (0.4 to 0.65 nm /min). A thin layer 2 to 9 nm of different roughness and density is observed at the top surface of tungsten film. Ar gas plasma is found more suitable for cleaning of tungsten surface.

  19. rf coupler technology for fusion applications

    International Nuclear Information System (INIS)

    Hoffman, D.J.

    1983-01-01

    Radio frequency (rf) oscillations at critical frequencies have successfully provided a means to convey power to fusion plasmas due to the electrical-magnetic properties of the plasma. While large rf systems to couple power to the plasma have been designed, built, and tested, the main link to the plasma, the coupler, is still in an evolutionary stage of development. Design and fabrication of optimal antennas for fusion applications are complicated by incomplete characterizations of the harsh plasma environment and of coupling mechanisms. A brief description of rf coupler technology required for plasma conditions is presented along with an assessment of the status and goals of coupler development

  20. Effect of Radio-Frequency and Low-Frequency Bias Voltage on the Formation of Amorphous Carbon Films Deposited by Plasma Enhanced Chemical Vapor Deposition

    International Nuclear Information System (INIS)

    Manis-Levy, Hadar; Mintz, Moshe H.; Livneh, Tsachi; Zukerman Ido; Raveh, Avi

    2014-01-01

    The effect of radio-frequency (RF) or low-frequency (LF) bias voltage on the formation of amorphous hydrogenated carbon (a-C:H) films was studied on silicon substrates with a low methane (CH 4 ) concentration (2–10 vol.%) in CH 4 +Ar mixtures. The bias substrate was applied either by RF (13.56 MHz) or by LF (150 kHz) power supply. The highest hardness values (∼18–22 GPa) with lower hydrogen content in the films (∼20 at.%) deposited at 10 vol.% CH 4 , was achieved by using the RF bias. However, the films deposited using the LF bias, under similar RF plasma generation power and CH 4 concentration (50 W and 10 vol.%, respectively), displayed lower hardness (∼6–12 GPa) with high hydrogen content (∼40 at.%). The structures analyzed by Fourier Transform Infrared (FTIR) and Raman scattering measurements provide an indication of trans-polyacetylene structure formation. However, its excessive formation in the films deposited by the LF bias method is consistent with its higher bonded hydrogen concentration and low level of hardness, as compared to the film prepared by the RF bias method. It was found that the effect of RF bias on the film structure and properties is stronger than the effect of the low-frequency (LF) bias under identical radio-frequency (RF) powered electrode and identical PECVD (plasma enhanced chemical vapor deposition) system configuration. (plasma technology)

  1. Plasma treatment of bulk niobium surface for superconducting rf cavities: Optimization of the experimental conditions on flat samples

    Directory of Open Access Journals (Sweden)

    M. Rašković

    2010-11-01

    Full Text Available Accelerator performance, in particular the average accelerating field and the cavity quality factor, depends on the physical and chemical characteristics of the superconducting radio-frequency (SRF cavity surface. Plasma based surface modification provides an excellent opportunity to eliminate nonsuperconductive pollutants in the penetration depth region and to remove the mechanically damaged surface layer, which improves the surface roughness. Here we show that the plasma treatment of bulk niobium (Nb presents an alternative surface preparation method to the commonly used buffered chemical polishing and electropolishing methods. We have optimized the experimental conditions in the microwave glow discharge system and their influence on the Nb removal rate on flat samples. We have achieved an etching rate of 1.7  μm/min⁡ using only 3% chlorine in the reactive mixture. Combining a fast etching step with a moderate one, we have improved the surface roughness without exposing the sample surface to the environment. We intend to apply the optimized experimental conditions to the preparation of single cell cavities, pursuing the improvement of their rf performance.

  2. Simulation of rarefied low pressure RF plasma flow around the sample

    International Nuclear Information System (INIS)

    Zheltukhin, V S; Shemakhin, A Yu

    2017-01-01

    The paper describes a mathematical model of the flow of radio frequency plasma at low pressure. The hybrid mathematical model includes the Boltzmann equation for the neutral component of the RF plasma, the continuity and the thermal equations for the charged component. Initial and boundary conditions for the corresponding equations are described. The electron temperature in the calculations is 1-4 eV, atoms temperature in the plasma clot is (3-4) • 10 3 K, in the plasma jet is (3.2-10) • 10 2 K, the degree of ionization is 10 -7 -10 -5 , electron density is 10 15 -10 19 m -3 . For calculations plasma parameters is developed soft package on C++ program language, that uses the OpenFOAM library package. Simulations for the vacuum chamber in the presence of a sample and the free jet flow were carried out. (paper)

  3. Optical characteristics of a RF DBD plasma jet in various {Ar}/ {O}_{2}Ar/O2 mixtures

    Science.gov (United States)

    Falahat, A.; Ganjovi, A.; Taraz, M.; Ravari, M. N. Rostami; Shahedi, A.

    2018-02-01

    In this paper, using the optical emission spectroscopy (OES) technique, the optical characteristics of a radiofrequency (RF) plasma jet are examined. The Ar/O2 mixture is taken as the operational gas and, the Ar percentage in the Ar/O2 mixture is varied from 70% to 95%. Using the optical emission spectrum analysis of the RF plasma jet, the excitation temperature is determined based on the Boltzmann plot method. The electron density in the plasma medium of the RF plasma jet is obtained by the Stark broadening of the hydrogen Balmer H_{β }. It is mostly seen that, the radiation intensity of Ar 4p→ 4s transitions at higher argon contributions in Ar/O2 mixture is higher. It is found that, at higher Ar percentages, the emission intensities from atomic oxygen (O) are higher and, the line intensities from the argon atoms and ions including O atoms linearly increase. It is observed that the quenching of Ar^{*} with O2 results in higher O species with respect to O2 molecules. In addition, at higher percentages of Ar in the Ar/O2 mixture, while the excitation temperature is decreased, the electron density is increased.

  4. Progress towards RF heated steady-state plasma operations on LHD by employing ICRF heating methods and improved divertor plates

    International Nuclear Information System (INIS)

    Kumazawa, R.; Mutoh, T.; Saito, K.

    2008-10-01

    A long pulse plasma discharge experiment was carried out using RF heating power in the Large Helical Device (LHD), a currentless magnetic confining system. Progress in long pulse operation is summarized since the 10th experimental campaign (2006). A scaling relation of the plasma duration time to the applied RF power has been derived from the experimental data so far collected. It indicates that there exists a critical divertor temperature and consequently a critical RF heating power P RFcrit =0.65 MW. The area on the graph of the duration time versus the RF heating power was extended over the scaling relation by replacing divertor plates with new ones with better heat conductivity. The cause of the plasma collapse at the end of the long pulse operation was found to be the penetration of metal impurities. Many thin flakes consisting of heavy metals and graphite in stratified layers were found on the divertor plates and it was thought that they were the cause of impurity metals penetrating into the plasma. In a simulation involving injecting a graphite-coated Fe pellet to the plasma it was found that 230 Eμm in the diameter of the Fe pellet sphere was the critical size which led the plasma to collapse. A mode-conversion heating method was examined in place of the minority ICRF heating which has been employed in almost all the long-pulse plasma discharges. It was found that this method was much better from the viewpoint of achieving uniformity of the plasma heat load to the divertors. It is expected that P RFcrit will be increased by using the mode-conversion heating method. (author)

  5. Observation of enhanced electric field in an RF-plugged sheet plasma in the RFC-XX-M open-ended machine

    International Nuclear Information System (INIS)

    Oda, T.; Takiyama, K.; Kadota, K.

    1987-12-01

    We report nonperturbing observation of the electric field in the sheet plasma for RF end-plugging on the RFC XX-M open-ended machine by using the Stark effect with a combined technique of beam-probe and laser-induced fluorescence. Under the optimum condition for the RF plugging, enhanced electric field is found in the sheet plasma by about 2.5 times with respect to the electric field when no plasma is produced. The field spatial profile is also measured, which is discussed in connection with the electrostatic eigenmode. (author)

  6. Development of an rf-driven plasma neutralizer for negative ions

    International Nuclear Information System (INIS)

    Moses, K.G.

    1989-01-01

    The assertion that beams of negative ions can be neutralized more efficiently by impacting a plasma, rather than a cold gas target, is confirmed scientifically by the work of K.H. Berkner et al. What remains to be done is the realization of practical means of generating plasmas efficiently with appropriate integrated line densities (target thickness). The work performed by JAYCOR, under this grant, over the past few years has made significant progress towards that goal. In this work, large volumes of plasma are generated using low-frequency pulsed inductive rf discharges within a ring cusp multipole-magnetic field geometry. These plasmas exhibit sufficient line-integrated electron densities and degrees of ionization to neutralize beams of energetic negative ions whose energies exceed 500 keV. The method of plasma generation and the cell configuration used in these studies are directly applicable to higher energy neutral beam injector systems (NBIS). Innate scalability and modularity of the system design facilitates linear stacking to achieve a desired target thickness. Further, the plasma formation process is accomplished with an electrical economy consistent with increased overall electrical efficiency of the NBIS compared to that possible using a cold gas target. 5 refs., 16 figs

  7. Steady state plasma operation in RF dominated regimes on EAST

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, X. J.; Zhao, Y. P.; Gong, X. Z.; Hu, C. D.; Liu, F. K.; Hu, L. Q.; Wan, B. N., E-mail: bnwan@ipp.ac.cn; Li, J. G. [Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031 (China)

    2015-12-10

    Significant progress has recently been made on EAST in the 2014 campaign, including the enhanced CW H&CD system over 20MW heating power (LHCD, ICRH and NBI), more than 70 diagnostics, ITER-like W-monoblock on upper divertor, two inner cryo-pumps and RMP coils, enabling EAST to investigate long pulse H mode operation with dominant electron heating and low torque to address the critical issues for ITER. H-mode plasmas were achieved by new H&CD system or 4.6GHz LHCD alone for the first time. Long pulse high performance H mode has been obtained by LHCD alone up to 28s at H{sub 98}∼1.2 or by combing of ICRH and LHCD, no or small ELM was found in RF plasmas, which is essential for steady state operation in the future Tokamak. Plasma operation in low collision regimes were implemented by new 4.6GHz LHCD with core Te∼4.5keV. The non-inductive scenarios with high performance at high bootstrap current fraction have been demonstrated in RF dominated regimes for long pulse operation. Near full non-inductive CD discharges have been achieved. In addition, effective heating and decoupling method under multi-transmitter for ICRF system were developed in this campaign, etc. EAST could be in operation with over 30MW CW heating and current drive power (LHCD ICRH NBI and ECRH), enhanced diagnostic capabilities and full actively-cooled metal wall from 2015. It will therefore allow to access new confinement regimes and to extend these regimes towards to steady state operation.

  8. Modification of the surface properties of glass-ceramic materials at low-pressure RF plasma stream

    Science.gov (United States)

    Tovstopyat, Alexander; Gafarov, Ildar; Galeev, Vadim; Azarova, Valentina; Golyaeva, Anastasia

    2018-05-01

    The surface roughness has a huge effect on the mechanical, optical, and electronic properties of materials. In modern optical systems, the specifications for the surface accuracy and smoothness of substrates are becoming even more stringent. Commercially available pre-polished glass-ceramic substrates were treated with the radio frequency (RF) inductively coupled (13.56 MHz) low-pressure plasma to clean the surface of the samples and decrease the roughness. Optical emission spectroscopy was used to investigate the plasma stream parameters and phase-shifted interferometry to investigate the surface of the specimen. In this work, the dependence of RF inductively coupled plasma on macroscopic parameters was investigated with the focus on improving the surfaces. The ion energy, sputtering rate, and homogeneity were investigated. The improvements of the glass-ceramic surfaces from 2.6 to 2.2 Å root mean square by removing the "waste" after the previous operations had been achieved.

  9. Influence of Plasma Pressure Fluctuation on RF Wave Propagation

    International Nuclear Information System (INIS)

    Liu Zhiwei; Bao Weimin; Li Xiaoping; Liu Donglin; Zhou Hui

    2016-01-01

    Pressure fluctuations in the plasma sheath from spacecraft reentry affect radio-frequency (RF) wave propagation. The influence of these fluctuations on wave propagation and wave properties is studied using methods derived by synthesizing the compressible turbulent flow theory, plasma theory, and electromagnetic wave theory. We study these influences on wave propagation at GPS and Ka frequencies during typical reentry by adopting stratified modeling. We analyzed the variations in reflection and transmission properties induced by pressure fluctuations. Our results show that, at the GPS frequency, if the waves are not totally reflected then the pressure fluctuations can remarkably affect reflection, transmission, and absorption properties. In extreme situations, the fluctuations can even cause blackout. At the Ka frequency, the influences are obvious when the waves are not totally transmitted. The influences are more pronounced at the GPS frequency than at the Ka frequency. This suggests that the latter can mitigate blackout by reducing both the reflection and the absorption of waves, as well as the influences of plasma fluctuations on wave propagation. Given that communication links with the reentry vehicles are susceptible to plasma pressure fluctuations, the influences on link budgets should be taken into consideration. (paper)

  10. Design of an RF Antenna for a Large-Bore, High Power, Steady State Plasma Processing Chamber for Material Separation

    International Nuclear Information System (INIS)

    Rasmussen, D.A.; Freeman, R.L.

    2001-01-01

    The purpose of this Cooperative Research and Development Agreement (CRADA) between UT-Battelle, LLC, (Contractor), and Archimedes Technology Group, (Participant) is to evaluate the design of an RF antenna for a large-bore, high power, steady state plasma processing chamber for material separation. Criteria for optimization will be to maximize the power deposition in the plasma while operating at acceptable voltages and currents in the antenna structure. The project objectives are to evaluate the design of an RF antenna for a large-bore, high power, steady state plasma processing chamber for material separation. Criteria for optimization will be to maximize the power deposition in the plasma while operating at acceptable voltages and currents in the antenna structure

  11. A High-Intensity, RF Plasma-Sputter Negative Ion Source

    International Nuclear Information System (INIS)

    Alton, G.D.; Bao, Y.; Cui, B.; Lohwasser, R.; Reed, C.A.; Zhang, T.

    1999-01-01

    A high-intensity, plasma-sputter negative-ion source based on the use of RF power for plasma generation has been developed that can be operated in either pulsed or dc modes. The source utilizes a high-Q, self-igniting, inductively coupled antenna system, operating at 80 MHz that has been optimized to generate Cs-seeded plasmas at low pressures (typically, - (610 microA); F - (100 microA); Si - (500 microA); S - (500 microA); P - (125 microA); Cl - (200 microA); Ni - (150 microA); Cu - (230 microA); Ge - (125 microA); As - (100 microA); Se - (200 microA); Ag - (70 microA); Pt - (125 microA); Au - (250 microA). The normalized emittance var e psilon n of the source at the 80% contour is: var e psilon n = 7.5 mm.mrad.(MeV) 1/2 . The design principles of the source, operational parameters, ion optics, emittance and intensities for a number of negative-ion species will be presented in this report

  12. VO2 Thermochromic Films on Quartz Glass Substrate Grown by RF-Plasma-Assisted Oxide Molecular Beam Epitaxy

    Directory of Open Access Journals (Sweden)

    Dong Zhang

    2017-03-01

    Full Text Available Vanadium dioxide (VO2 thermochromic thin films with various thicknesses were grown on quartz glass substrates by radio frequency (RF-plasma assisted oxide molecular beam epitaxy (O-MBE. The crystal structure, morphology and chemical stoichiometry were investigated systemically by X-ray diffraction (XRD, atomic force microscopy (AFM, Raman spectroscopy and X-ray photoelectron spectroscopy (XPS analyses. An excellent reversible metal-to-insulator transition (MIT characteristics accompanied by an abrupt change in both electrical resistivity and optical infrared (IR transmittance was observed from the optimized sample. Remarkably, the transition temperature (TMIT deduced from the resistivity-temperature curve was reasonably consistent with that obtained from the temperature-dependent IR transmittance. Based on Raman measurement and XPS analyses, the observations were interpreted in terms of residual stresses and chemical stoichiometry. This achievement will be of great benefit for practical application of VO2-based smart windows.

  13. Rf-plasma synthesis of nanosize silicon carbide and nitride. Final report

    Energy Technology Data Exchange (ETDEWEB)

    Buss, R.J.

    1997-02-01

    A pulsed rf plasma technique is capable of generating ceramic particles of 10 manometer dimension. Experiments using silane/ammonia and trimethylchlorosilane/hydrogen gas mixtures show that both silicon nitride and silicon carbide powders can be synthesized with control of the average particle diameter from 7 to 200 nm. Large size dispersion and much agglomeration appear characteristic of the method, in contrast to results reported by another research group. The as produced powders have a high hydrogen content and are air and moisture sensitive. Post-plasma treatment in a controlled atmosphere at elevated temperature (800{degrees}C) eliminates the hydrogen and stabilizes the powder with respect to oxidation or hydrolysis.

  14. Low frequency RF heating of plasmas in a toroidal stellarator

    International Nuclear Information System (INIS)

    Golovato, S.N.

    1977-01-01

    Studies of transit-time magnetic pumping and Alfven wave heating have been done in the Proto-Cleo stellarator. Both plasma heating and plasma confinement have been investigated. A traveling wave was launched around the Proto-Cleo l = 2, 6 field period stellarator to attempt transit-time magnetic pumping of a pulsed electron beam moving along the magnetic field lines. An apparent loss of the beam was seen when the transit-time magnetic pumping was applied. A random walk diffusion of the beam electrons with a step size determined by the radial EXB drift due to the poloidal electric field agrees well with the experimental results. Alfven wave heating was applied to plasmas in the Proto-Cleo l = 3, 7 field period stellarator. Global excitation of Alfven waves was accomplished by exciting an electrostatically shielded helical winding corresponding to a q = 3 rational field line with a pulsed, high-power RF source. Theoretical analysis of this helical wave launcher predicted effective energy absorption in the Proto-Cleo gun-produced plasma

  15. Negative ion mass spectra and particulate formation in rf silane plasma deposition experiments

    International Nuclear Information System (INIS)

    Howling, A.A.; Dorier, J.L.; Hollenstein, C.

    1992-09-01

    Negative ions have been clearly identified in silane rf plasmas used for the deposition of amorphous silicon. Mass spectra were measured for monosilicon up to pentasilicon negative ion radical groups in power-modulated plasmas by means of a mass spectrometer mounted just outside the glow region. Negative ions were only observed over a limited range of power modulation frequency which corresponds to particle-free conditions. The importance of negative ions regarding particulate formation is demonstrated and commented upon. (author) 3 figs., 19 refs

  16. Structural and photoluminescence investigation on the hot-wire assisted plasma enhanced chemical vapor deposition growth silicon nanowires

    International Nuclear Information System (INIS)

    Chong, Su Kong; Goh, Boon Tong; Wong, Yuen-Yee; Nguyen, Hong-Quan; Do, Hien; Ahmad, Ishaq; Aspanut, Zarina; Muhamad, Muhamad Rasat; Dee, Chang Fu; Rahman, Saadah Abdul

    2012-01-01

    High density of silicon nanowires (SiNWs) were synthesized by a hot-wire assisted plasma enhanced chemical vapor deposition technique. The structural and optical properties of the as-grown SiNWs prepared at different rf power of 40 and 80 W were analyzed in this study. The SiNWs prepared at rf power of 40 W exhibited highly crystalline structure with a high crystal volume fraction, X C of ∼82% and are surrounded by a thin layer of SiO x . The NWs show high absorption in the high energy region (E>1.8 eV) and strong photoluminescence at 1.73 to 2.05 eV (red–orange region) with a weak shoulder at 1.65 to 1.73 eV (near IR region). An increase in rf power to 80 W reduced the X C to ∼65% and led to the formation of nanocrystalline Si structures with a crystallite size of <4 nm within the SiNWs. These NWs are covered by a mixture of uncatalyzed amorphous Si layer. The SiNWs prepared at 80 W exhibited a high optical absorption ability above 99% in the broadband range between 220 and ∼1500 nm and red emission between 1.65 and 1.95 eV. The interesting light absorption and photoluminescence properties from both SiNWs are discussed in the text. - Highlights: ► Growth of random oriented silicon nanowires using hot-wire assisted plasma enhanced chemical vapor deposition. ► Increase in rf power reduces the crystallinity of silicon nanowires. ► High density and nanocrystalline structure in silicon nanowires significant enhance the near IR light absorption. ► Oxide defects and silicon nanocrystallites in silicon nanowires reveal photoluminescence in red–orange and red regions.

  17. Experimental setup for producing tungsten coated graphite tiles using plasma enhanced chemical vapor deposition technique for fusion plasma applications

    International Nuclear Information System (INIS)

    Chauhan, Sachin Singh; Sharma, Uttam; Choudhary, K.K.; Sanyasi, A.K.; Ghosh, J.; Sharma, Jayshree

    2013-01-01

    Plasma wall interaction (PWI) in fusion grade machines puts stringent demands on the choice of materials in terms of high heat load handling capabilities and low sputtering yields. Choice of suitable material still remains a challenge and open topic of research for the PWI community. Carbon fibre composites (CFC), Beryllium (Be), and Tungsten (W) are now being considered as first runners for the first wall components of future fusion machines. Tungsten is considered to be one of the suitable materials for the job because of its superior properties than carbon like low physical sputtering yield and high sputter energy threshold, high melting point, fairly high re-crystallization temperature, low fuel retention capabilities, low chemical sputtering with hydrogen and its isotopes and most importantly the reparability with various plasma techniques both ex-situ and in-situ. Plasma assisted chemical vapour deposition is considered among various techniques as the most preferable technique for fabricating tungsten coated graphite tiles to be used as tokamak first wall and target components. These coated tiles are more favourable compared to pure tungsten due to their light weight and easier machining. A system has been designed, fabricated and installed at SVITS, Indore for producing tungsten coated graphite tiles using Plasma Enhanced Chemical Vapor Deposition (PE-CVD) technique for Fusion plasma applications. The system contains a vacuum chamber, a turbo-molecular pump, two electrodes, vacuum gauges, mass analyzer, mass flow controllers and a RF power supply for producing the plasma using hydrogen gas. The graphite tiles will be put on one of the electrodes and WF6 gas will be inserted in a controlled manner in the hydrogen plasma to achieve the tungsten-coating with WF6 dissociation. The system is integrated at SVITS, Indore and a vacuum of the order of 3*10 -6 is achieved and glow discharge plasma has been created to test all the sub-systems. The system design with

  18. Studies of RF sheaths and diagnostics on IShTAR

    Energy Technology Data Exchange (ETDEWEB)

    Crombé, K., E-mail: Kristel.Crombe@UGent.be [Department of Applied Physics, Ghent University, Ghent (Belgium); LPP-ERM/KMS, Royal Military Academy, Brussels (Belgium); Devaux, S.; Faudot, E.; Heuraux, S.; Moritz, J. [YIJL, UMR7198 CNRS-Université de Lorraine, Nancy (France); D’Inca, R.; Faugel, H.; Fünfgelder, H.; Jacquot, J.; Ochoukov, R. [Max-Planck-Institut für Plasmaphysik, Garching (Germany); Louche, F.; Tripsky, M.; Van Eester, D.; Wauters, T. [LPP-ERM/KMS, Royal Military Academy, Brussels (Belgium); Noterdaeme, J.-M. [Department of Applied Physics, Ghent University, Ghent (Belgium); Max-Planck-Institut für Plasmaphysik, Garching (Germany)

    2015-12-10

    IShTAR (Ion cyclotron Sheath Test ARrangement) is a linear magnetised plasma test facility for RF sheaths studies at the Max-Planck-Institut für Plasmaphysik in Garching. In contrast to a tokamak, a test stand provides more liberty to impose the parameters and gives better access for the instrumentation and antennas. The project will support the development of diagnostic methods for characterising RF sheaths and validate and improve theoretical predictions. The cylindrical vacuum vessel has a diameter of 1 m and is 1.1 m long. The plasma is created by an external cylindrical plasma source equipped with a helical antenna that has been designed to excite the m=1 helicon mode. In inductive mode, plasma densities and electron temperatures have been characterised with a planar Langmuir probe as a function of gas pressure and input RF power. A 2D array of RF compensated Langmuir probes and a spectrometer are planned. A single strap RF antenna has been designed; the plasma-facing surface is aligned to the cylindrical plasma to ease the modelling. The probes will allow direct measurements of plasma density profiles in front of the RF antenna, and thus a detailed study of the density modifications induced by RF sheaths, which influences the coupling. The RF antenna frequency has been chosen to study different plasma wave interactions: the accessible plasma density range includes an evanescent and propagative behaviour of slow or fast waves, and allows the study of the effect of the lower hybrid resonance layer.

  19. Plasma-chemical processes and systems

    International Nuclear Information System (INIS)

    Castro B, J.

    1987-01-01

    The direct applications of plasma technology on chemistry and metallurgy are presented. The physical fundaments of chemically active non-equilibrium plasma, the reaction kinetics, and the physical chemical transformations occuring in the electrical discharges, which are applied in the industry, are analysed. Some plasma chemical systems and processes related to the energy of hydrogen, with the chemical technology and with the metallurgy are described. Emphasis is given to the optimization of the energy effectiveness of these processes to obtain reducers and artificial energetic carriers. (M.C.K.) [pt

  20. Investigation of rf plasma light sources for dye laser excitation

    International Nuclear Information System (INIS)

    Kendall, J.S.; Jaminet, J.F.

    1975-06-01

    Analytical and experimental studies were performed to assess the applicability of radio frequency (rf) induction heated plasma light sources for potential excitation of continuous dye lasers. Experimental efforts were directed toward development of a continuous light source having spectral flux and emission characteristics approaching that required for pumping organic dye lasers. Analytical studies were performed to investigate (1) methods of pulsing the light source to obtain higher radiant intensity and (2) methods of integrating the source with a reflective cavity for pumping a dye cell. (TFD)

  1. Plasma polymer films rf sputtered from PTFE under various argon pressures

    Czech Academy of Sciences Publication Activity Database

    Stelmashuk, Vitaliy; Biederman, H.; Slavinská, D.; Zemek, Josef; Trchová, Miroslava

    2005-01-01

    Roč. 77, č. 2 (2005), s. 131-137 ISSN 0042-207X R&D Projects: GA MŠk(CZ) OC 527.10; GA MŠk(CZ) OC 527.90 Grant - others:EUREKAΣ2080(XE) OE57 Institutional research plan: CEZ:AV0Z10100521; CEZ:AV0Z20430508 Keywords : RF sputtering * PTFE * fluorcarbon plasma polymers * thin film * teflon * deposition Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 0.909, year: 2005

  2. Chemical and microstructural characterizations of plasma polymer films by time-of-flight secondary ion mass spectrometry and principal component analysis

    Energy Technology Data Exchange (ETDEWEB)

    Cossement, Damien, E-mail: damien.cossement@materianova.be [Materia Nova Research Center, Parc Initialis, 1, Avenue Nicolas Copernic, B-7000 Mons (Belgium); Renaux, Fabian [Materia Nova Research Center, Parc Initialis, 1, Avenue Nicolas Copernic, B-7000 Mons (Belgium); Thiry, Damien; Ligot, Sylvie [Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, B-7000 Mons (Belgium); Francq, Rémy; Snyders, Rony [Materia Nova Research Center, Parc Initialis, 1, Avenue Nicolas Copernic, B-7000 Mons (Belgium); Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, B-7000 Mons (Belgium)

    2015-11-15

    Graphical abstract: - Highlights: • Plasma polymer films have a chemical selectivity and a cross-linking degree which are known to vary in opposite trends. • Three plasma polymers families were used as model organic layers for cross-linking evaluation by ToF-SIMS and principal component analysis. • The data were cross-checked with related functional properties that are known to depend on the cross-linking degree (stability in solvent, mechanical properties, …). • The suggested cross-linking evaluation method was validated for different families of plasma polymers demonstrating that it can be seen as a “general” method. - Abstract: It is accepted that the macroscopic properties of functional plasma polymer films (PPF) are defined by their functional density and their crosslinking degree (χ) which are quantities that most of the time behave in opposite trends. If the PPF chemistry is relatively easy to evaluate, it is much more challenging for χ. This paper reviews the recent work developed in our group on the application of principal component analysis (PCA) to time-of-flight secondary ion mass spectrometric (ToF-SIMS) positive spectra data in order to extract the relative cross-linking degree (χ) of PPF. NH{sub 2}-, COOR- and SH-containing PPF synthesized in our group by plasma enhanced chemical vapor deposition (PECVD) varying the applied radiofrequency power (P{sub RF}), have been used as model surfaces. For the three plasma polymer families, the scores of the first computed principal component (PC1) highlighted significant differences in the chemical composition supported by X-Ray photoelectron spectroscopy (XPS) data. The most important fragments contributing to PC1 (loadings > 90%) were used to compute an average C/H ratio index for samples synthesized at low and high P{sub RF}. This ratio being an evaluation of χ, these data, accordingly to the literature, indicates an increase of χ with P{sub RF} excepted for the SH-PPF. These results have

  3. Decomposition of SF6-R134a effluents by RF plasma

    International Nuclear Information System (INIS)

    Joshi, Avinash V.

    2012-01-01

    The efficiency of recovery achieved by open or closed loop extraction of RPC exhaust gases is in the range of 90-95% under optimum conditions. For a large detector setup operating on one volume change per day basis, a 5% loss amounts to discharging 50 kg of R134a and 0.5 kg of SF 6 into atmosphere every day. The emissions are equivalent to create nearly 50 000 m 3 of carbon dioxide daily. The gas emissions need to be completely converted to safer compounds. The gases such as R134a and SF 6 are stable compounds. In order to decompose these, the mixture is first activated by adding of 50% oxygen and 2% argon and under typical RF plasma conditions of 13.56 MHz, 1 Torr pressure and 0.2 W/cm 2 power density. The chemical reaction takes place on the surface of a silicon electrode. The product of the reaction is mainly SiF 4 (gas), which is further hydrolyzed to form HF solution and silicon hydroxide sludge. More than 90% of the effluent gas mixture can be effectively removed by this method.

  4. Plasma flow around and charge distribution of a dust cluster in a rf discharge

    Science.gov (United States)

    Schleede, J.; Lewerentz, L.; Bronold, F. X.; Schneider, R.; Fehske, H.

    2018-04-01

    We employ a particle-in-cell Monte Carlo collision/particle-particle particle-mesh simulation to study the plasma flow around and the charge distribution of a three-dimensional dust cluster in the sheath of a low-pressure rf argon discharge. The geometry of the cluster and its position in the sheath are fixed to the experimental values, prohibiting a mechanical response of the cluster. Electrically, however, the cluster and the plasma environment, mimicking also the experimental situation, are coupled self-consistently. We find a broad distribution of the charges collected by the grains. The ion flux shows on the scale of the Debye length strong focusing and shadowing inside and outside the cluster due to the attraction of the ions to the negatively charged grains, whereas the electron flux is characterized on this scale only by a weak spatial modulation of its magnitude depending on the rf phase. On the scale of the individual dust potentials, however, the electron flux deviates in the vicinity of the cluster strongly from the laminar flow associated with the plasma sheath. It develops convection patterns to compensate for the depletion of electrons inside the dust cluster.

  5. Radiofrequency cold plasma nitrided carbon steel: Microstructural and micromechanical characterizations

    International Nuclear Information System (INIS)

    Bouanis, F.Z.; Bentiss, F.; Bellayer, S.; Vogt, J.B.; Jama, C.

    2011-01-01

    Highlights: → C38 carbon steel samples were plasma nitrided using a radiofrequency (rf) nitrogen plasma discharge. → RF plasma treatment enables nitriding for non-heated substrates. → The morphological and chemical analyses show the formation of a uniform thickness on the surface of the nitrided C38 steel. → Nitrogen plasma active species diffuse into the samples and lead to the formation of Fe x N. → The increase in microhardness values for nitrided samples with plasma processing time is interpreted by the formation of a thicker nitrided layer on the steel surface. - Abstract: In this work, C38 carbon steel was plasma nitrided using a radiofrequency (rf) nitrogen plasma discharge on non-heated substrates. General characterizations were performed to compare the chemical compositions, the microstructures and hardness of the untreated and plasma treated surfaces. The plasma nitriding was carried out on non-heated substrates at a pressure of 16.8 Pa, using N 2 gas. Surface characterizations before and after N 2 plasma treatment were performed by means of the electron probe microanalysis (EPMA), X-ray photoelectron spectroscopy (XPS) and Vickers microhardness measurements. The morphological and chemical analysis showed the formation of a uniform structure on the surface of the nitrided sample with enrichment in nitrogen when compared to untreated sample. The thickness of the nitride layer formed depends on the treatment time duration and is approximately 14 μm for 10 h of plasma treatment. XPS was employed to obtain chemical-state information of the plasma nitrided steel surfaces. The micromechanical results show that the surface microhardness increases as the plasma-processing time increases to reach, 1487 HV 0.005 at a plasma processing time of 8 h.

  6. Radiofrequency cold plasma nitrided carbon steel: Microstructural and micromechanical characterizations

    Energy Technology Data Exchange (ETDEWEB)

    Bouanis, F.Z. [Universite Lille Nord de France, F-59000 Lille (France); Unite Materiaux et Transformations (UMET), Ingenierie des Systemes Polymeres, CNRS UMR 8207, ENSCL, BP 90108, F-59652 Villeneuve d' Ascq Cedex (France); Bentiss, F. [Laboratoire de Chimie de Coordination et d' Analytique, Faculte des Sciences, Universite Chouaib Doukkali, B.P. 20, M-24000 El Jadida (Morocco); Bellayer, S.; Vogt, J.B. [Universite Lille Nord de France, F-59000 Lille (France); Unite Materiaux et Transformations (UMET), Ingenierie des Systemes Polymeres, CNRS UMR 8207, ENSCL, BP 90108, F-59652 Villeneuve d' Ascq Cedex (France); Jama, C., E-mail: charafeddine.jama@ensc-lille.fr [Universite Lille Nord de France, F-59000 Lille (France); Unite Materiaux et Transformations (UMET), Ingenierie des Systemes Polymeres, CNRS UMR 8207, ENSCL, BP 90108, F-59652 Villeneuve d' Ascq Cedex (France)

    2011-05-16

    Highlights: {yields} C38 carbon steel samples were plasma nitrided using a radiofrequency (rf) nitrogen plasma discharge. {yields} RF plasma treatment enables nitriding for non-heated substrates. {yields} The morphological and chemical analyses show the formation of a uniform thickness on the surface of the nitrided C38 steel. {yields} Nitrogen plasma active species diffuse into the samples and lead to the formation of Fe{sub x}N. {yields} The increase in microhardness values for nitrided samples with plasma processing time is interpreted by the formation of a thicker nitrided layer on the steel surface. - Abstract: In this work, C38 carbon steel was plasma nitrided using a radiofrequency (rf) nitrogen plasma discharge on non-heated substrates. General characterizations were performed to compare the chemical compositions, the microstructures and hardness of the untreated and plasma treated surfaces. The plasma nitriding was carried out on non-heated substrates at a pressure of 16.8 Pa, using N{sub 2} gas. Surface characterizations before and after N{sub 2} plasma treatment were performed by means of the electron probe microanalysis (EPMA), X-ray photoelectron spectroscopy (XPS) and Vickers microhardness measurements. The morphological and chemical analysis showed the formation of a uniform structure on the surface of the nitrided sample with enrichment in nitrogen when compared to untreated sample. The thickness of the nitride layer formed depends on the treatment time duration and is approximately 14 {mu}m for 10 h of plasma treatment. XPS was employed to obtain chemical-state information of the plasma nitrided steel surfaces. The micromechanical results show that the surface microhardness increases as the plasma-processing time increases to reach, 1487 HV{sub 0.005} at a plasma processing time of 8 h.

  7. RF induction plasma spheroidization of tungsten powders

    International Nuclear Information System (INIS)

    Gu Zhogntao; Ye Gaoying; Liu Chuandong; Tong Honghui

    2009-01-01

    Irregularly-shaped tungsten powders (average granular sizes of 512 μm) have been spheroidized by radio frequency (RF)induction plasma. The effects of feed rate, mode of material dispersion, particle size on spheroidization efficiency are investigated. Experimental results show that the spheroidization efficiency decreases rapidly when the feed rate increases to more than 95 g/min. Only 30% spheroidization efficiency is gained at the feed rate of 135.75 g/min. The spheroidization efficiency is also affected by the flow rate of carrier gas. When the flow rate of carrier gas is 0.12 m 3 /h, the dispersion effect is the best, and the spheroidization efficiency is almost 100%. The apparent density of tungsten powders increases a bit with the increase of spheroidization efficiency. And the particle size uniformity of spheroidized tungsten powders is in accordance with that of original powders. (authors)

  8. RF sheaths for arbitrary B field angles

    Science.gov (United States)

    D'Ippolito, Daniel; Myra, James

    2014-10-01

    RF sheaths occur in tokamaks when ICRF waves encounter conducting boundaries and accelerate electrons out of the plasma. Sheath effects reduce the efficiency of ICRF heating, cause RF-specific impurity influxes from the edge plasma, and increase the plasma-facing component damage. The rf sheath potential is sensitive to the angle between the B field and the wall, the ion mobility and the ion magnetization. Here, we obtain a numerical solution of the non-neutral rf sheath and magnetic pre-sheath equations (for arbitrary values of these parameters) and attempt to infer the parametric dependences of the Child-Langmuir law. This extends previous work on the magnetized, immobile ion regime. An important question is how the rf sheath voltage distributes itself between sheath and pre-sheath for various B field angles. This will show how generally previous estimates of the rf sheath voltage and capacitance were reasonable, and to improve the RF sheath BC. Work supported by US DOE grants DE-FC02-05ER54823 and DE-FG02-97ER54392.

  9. Investigation of parameters of the working substance - low temperature plasma in the ionization resonator chamber of the RF reactive engine

    International Nuclear Information System (INIS)

    Vdovin, V.S.; Zajtzev, B.V.; Kobetz, A.F.; Bomko, V.A.; Rashkovan, V.M.; Bazyma, L.A.; Belokon, V.I.

    2003-01-01

    This paper is the extension of investigations of the RF engine designed for orientation and stabilization of the spacecrafts orbit, and it is undertaken for measuring of plasma parameters of RF discharge in the ionization resonator chamber. The experiments were performed at the frequency of 80 MHz on the model engine, in which a length of coaxial line with shortening capacities at the ends was used as the ionization resonator chamber. As the result of the experiments, conditions of the RF discharge ignition in the resonator chamber are studied; dependencies of plasma density and temperature versus applied power and working body pressure are obtained for various gases. The measurements of the thrust were performed at the special-purpose test bench

  10. RF plasma cleaning of silicon substrates with high-density polyethylene contamination

    Science.gov (United States)

    Cagomoc, Charisse Marie D.; De Leon, Mark Jeffry D.; Ebuen, Anna Sophia M.; Gilos, Marlo Nicole R.; Vasquez, Magdaleno R., Jr.

    2018-01-01

    Upon contact with a polymeric material, microparticles from the polymer may adhere to a silicon (Si) substrate during device processing. The adhesion contaminates the surface and, in turn, leads to defects in the fabricated Si-based microelectronic devices. In this study, Si substrates with artificially induced high-density polyethylene (HDPE) contamination was exposed to 13.56 MHz radio frequency (RF) plasma utilizing argon and oxygen gas admixtures at a power density of 5.6 W/cm2 and a working pressure of 110 Pa for up to 6 min of treatment. Optical microscopy studies revealed the removal of up to 74% of the polymer contamination upon plasma exposure. Surface free energy (SFE) increased owing to the removal of contaminants as well as the formation of polar groups on the Si surface after plasma treatment. Atomic force microscopy scans showed a decrease in surface roughness from 12.25 nm for contaminated samples to 0.77 nm after plasma cleaning. The smoothening effect can be attributed to the removal of HDPE particles from the surface. In addition, scanning electron microscope images showed that there was a decrease in the amount of HDPE contaminants adhering onto the surface after plasma exposure.

  11. Sputter deposition of tantalum-nitride films on copper using an rf-plasma

    International Nuclear Information System (INIS)

    Walter, K.C.; Fetherston, R.P.; Sridharan, K.; Chen, A.; Shamim, M.M.; Conrad, J.R.

    1994-01-01

    A tantalum-nitride film was successfully deposited at ambient temperature on copper with a modified ion-assisted-deposition (IAD) technique. The process uses an argon and nitrogen plasma to sputter deposit from a tantalum rf-cathode and ion implant the deposited film simultaneously. Both argon and nitrogen ions are used for sputtering and ion implantation. Auger spectroscopy and x-ray diffraction were used to characterize the resulting film

  12. About of the Electrostatic fields excitation theory by a RF wave in a plasma; Acerca de la teoria de excitacion de campos electrostaticos por una onda de rf en un plasma

    Energy Technology Data Exchange (ETDEWEB)

    Gutierrez T, C.R

    1991-01-15

    In an unidimensional model is shown in the cases of a semi limited plasma and a layer of plasma the excitement mechanism of electrostatic fields for a radiofrequency wave (RF) polarized lineally. This phenomenon depends strongly on the combined action of the Miller force and that of impulsion. It is shown that the action of these forces is carried out in different characteristic times when the front of wave crosses through the plasma. The cases of a semi limited plasma and of a layer of plasma without and with current are analyzed. It is shown that near the frontiers of the plasma where the field is sufficiently big arise oscillations of the width of the field that are slowly muffled in the space in an exponential way. In the cases of a plasma layer its are shown that the processes that arise near the frontier x = L are similar to the processes that arise near the frontier x = 0. The existence of current in the plasma layer leads to the blockade of the excited perturbations in the frontier x = L. (Author)

  13. Controlling the Plasma-Polymerization Process of N-Vinyl-2-pyrrolidone

    DEFF Research Database (Denmark)

    Norrman, Kion; Winther-Jensen, Bjørn

    2005-01-01

    N-vinyl-2-pyrrolidone was plasma-polymerized on glass substrates using a pulsed AC plasma. Pulsed AC plasma produces a chemical surface structure different from that produced by conventional RF plasma; this is ascribed to the different power regimes used. A high degree of control over the structure...... of the chemical surface was obtained using pulsed AC plasma, as shown by ToF-SIMS. It is demonstrated how the experimental conditions to some extent control the chemical structure of the plasma-polymerized film, e.g., film thickness, density of post-plasma-polymerized oligomeric chains, and the density of intact...

  14. Powder processing and spheroidizing with thermal inductively coupled plasma

    International Nuclear Information System (INIS)

    Nutsch, G.; Linke, P.; Zakharian, S.; Dzur, B.; Weiss, K.-H.

    2001-01-01

    Processing of advanced powder materials for the spraying industry is one of the most promising applications of the thermal RF inductively coupled plasma. By selecting the feedstock carefully and adjusting the RF plasma parameters, unique materials with high quality can be achieved. Powders injected in the hot plasma core emerge with modified shapes, morphology, crystal structure and chemical composition. Ceramic oxide powders such as Al 2 O 3 , ZrO 2 , SiO 2 are spheroidized with a high spheroidization rate. By using the RF induction plasma spheroidizing process tungsten melt carbide powders are obtained with a high spheroidization rate at high feeding rates by densification of agglomerated powders consisting of di-tungsten carbide and monocarbide with a definite composition. This kind of ball-like powders is particularly suited for wear resistant applications. (author)

  15. Dependence of beam emittance on plasma electrode temperature and rf-power, and filter-field tuning with center-gapped rod-filter magnets in J-PARC rf-driven H− ion source

    International Nuclear Information System (INIS)

    Ueno, A.; Koizumi, I.; Ohkoshi, K.; Ikegami, K.; Takagi, A.; Yamazaki, S.; Oguri, H.

    2014-01-01

    The prototype rf-driven H − ion-source with a nickel plated oxygen-free-copper (OFC) plasma chamber, which satisfies the Japan Proton Accelerator Research Complex (J-PARC) 2nd stage requirements of a H − ion beam current of 60 mA within normalized emittances of 1.5 π mm mrad both horizontally and vertically, a flat top beam duty factor of 1.25% (500 μs × 25 Hz) and a life-time of more than 50 days, was reported at the 3rd international symposium on negative ions, beams, and sources (NIBS2012). The experimental results of the J-PARC ion source with a plasma chamber made of stainless-steel, instead of nickel plated OFC used in the prototype source, are presented in this paper. By comparing these two sources, the following two important results were acquired. One was that the about 20% lower emittance was produced by the rather low plasma electrode (PE) temperature (T PE ) of about 120 °C compared with the typically used T PE of about 200 °C to maximize the beam current for the plasma with the abundant cesium (Cs). The other was that by using the rod-filter magnets with a gap at each center and tuning the gap-lengths, the filter-field was optimized and the rf-power necessary to produce the J-PARC required H − ion beam current was reduced typically 18%. The lower rf-power also decreases the emittances

  16. DOE planning workshop on rf theory and computations

    International Nuclear Information System (INIS)

    1984-01-01

    The purpose of the two-day workshop-meeting was to review the status of rf heating in magnetic fusion plasmas and to determine the outstanding problems in this area. The term rf heating was understood to encompass not only bulk plasma heating by externally applied electromagnetic power but also current generation in toroidal plasmas and generation of thermal barriers in tandem mirror plasmas

  17. Radio Frequency Plasma Applications for Space Propulsion

    International Nuclear Information System (INIS)

    Baity, F.W. Jr.; Barber, G.C.; Carter, M.D.; Chang-Diaz, F.R.; Goulding, R.H.; Ilin, A.V.; Jaeger, E.F.; Sparks, D.O.; Squire, J.P.

    1999-01-01

    Recent developments in solid-state radio frequency (RF) power technologies allow for the practical consideration of RF heated plasmas for space propulsion. These technologies permit the use of any electrical power source, de-couple the power and propellant sources, and allow for the efficient use of both the propellant mass and power. Efficient use of the propellant is obtained by expelling the rocket exhaust at the highest possible velocity, which can be orders of magnitude higher than those achieved in chemical rockets. Handling the hot plasma exhaust requires the use of magnetic nozzles, and the basic physics of ion detachment from the magnetic eld is discussed. The plasma can be generated by RF using helicon waves to heat electrons. Further direct heating of the ions helps to reduce the line radiation losses, and the magnetic geometry is tailored to allow ion cyclotron resonance heating. RF eld and ion trajectory calculations are presented to give a reasonably self-consistent picture of the ion acceleration process

  18. Time-Domain Modeling of RF Antennas and Plasma-Surface Interactions

    Directory of Open Access Journals (Sweden)

    Jenkins Thomas G.

    2017-01-01

    Full Text Available Recent advances in finite-difference time-domain (FDTD modeling techniques allow plasma-surface interactions such as sheath formation and sputtering to be modeled concurrently with the physics of antenna near- and far-field behavior and ICRF power flow. Although typical sheath length scales (micrometers are much smaller than the wavelengths of fast (tens of cm and slow (millimeter waves excited by the antenna, sheath behavior near plasma-facing antenna components can be represented by a sub-grid kinetic sheath boundary condition, from which RF-rectified sheath potential variation over the surface is computed as a function of current flow and local plasma parameters near the wall. These local time-varying sheath potentials can then be used, in tandem with particle-in-cell (PIC models of the edge plasma, to study sputtering effects. Particle strike energies at the wall can be computed more accurately, consistent with their passage through the known potential of the sheath, such that correspondingly increased accuracy of sputtering yields and heat/particle fluxes to antenna surfaces is obtained. The new simulation capabilities enable time-domain modeling of plasma-surface interactions and ICRF physics in realistic experimental configurations at unprecedented spatial resolution. We will present results/animations from high-performance (10k-100k core FDTD/PIC simulations of Alcator C-Mod antenna operation.

  19. Improvement of In-Flight Alumina Spheroidization Process Using a Small Power Argon DC-RF Hybrid Plasma Flow System by Helium Mixture

    Science.gov (United States)

    Takana, Hidemasa; Jang, Juyong; Igawa, Junji; Nakajima, Tomoki; Solonenko, Oleg P.; Nishiyama, Hideya

    2011-03-01

    For the further improvement of in-flight alumina spheroidization process with a low-power direct-current radiofrequency (DC-RF) hybrid plasma flow system, the effect of a small amount of helium gas mixture in argon main gas and also the effect of increasing DC nozzle diameter on powder spheroidization ratio have been experimentally clarified with correlating helium gas mixture percentage, plasma enthalpy, powder in-flight velocity, and temperature. The alumina spheroidization ratio increases by helium gas mixture as a result of enhancement of plasma enthalpy. The highest spheroidization ratio is obtained by 4% mixture of helium in central gas with enlarging nozzle diameter from 3 to 4 mm, even under the constant low input electric power given to a DC-RF hybrid plasma flow system.

  20. Chemically reactive species in liquids generated by atmospheric-pressure plasmas and their roles in plasma medicine

    International Nuclear Information System (INIS)

    Hamaguchi, Satoshi

    2013-01-01

    Plasmas whose gas temperatures are close to room temperature may be generated in ambient air or a gas at atmospheric pressure with the use of low-frequency high voltage or low-power radio-frequency (RF) or microwave power applied to electrodes. Such plasmas can serve as a powerful source of free radicals and/or chemically reactive species that arise from atoms and molecules of the ambient gas. Recently use of such plasmas for medical purposes has attracted much attention as they can be implemented in possible medical devices that can cause blood coagulation, heal wounds, facilitate angiogenesis, sterilize surgical devices as well as living tissues without harming healthy cells, and selectively inactivate cancer cells. Especially of interest among reactive species generated by atmospheric-pressure plasmas (APP) are reactive oxygen species (ROS) and reactive nitrogen species (RNS) that are generated in liquid phase. Since most living tissues and cells are immersed in liquids (such as blood or culture media), reactive species generated by APPs in the gas phase are transported to the liquid phase and possibly converted to different types of reactive species therein before causing some influence on the tissues or cells. In this study, the rate equations are solved to evaluate concentrations of various reactive species in pure water that are originated by plasma reactions in atmosphere and possible effects of such species (including ROS/RNS) on living tissues and cells are discussed

  1. Chemically reactive species in liquids generated by atmospheric-pressure plasmas and their roles in plasma medicine

    Energy Technology Data Exchange (ETDEWEB)

    Hamaguchi, Satoshi [Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871 (Japan)

    2013-07-11

    Plasmas whose gas temperatures are close to room temperature may be generated in ambient air or a gas at atmospheric pressure with the use of low-frequency high voltage or low-power radio-frequency (RF) or microwave power applied to electrodes. Such plasmas can serve as a powerful source of free radicals and/or chemically reactive species that arise from atoms and molecules of the ambient gas. Recently use of such plasmas for medical purposes has attracted much attention as they can be implemented in possible medical devices that can cause blood coagulation, heal wounds, facilitate angiogenesis, sterilize surgical devices as well as living tissues without harming healthy cells, and selectively inactivate cancer cells. Especially of interest among reactive species generated by atmospheric-pressure plasmas (APP) are reactive oxygen species (ROS) and reactive nitrogen species (RNS) that are generated in liquid phase. Since most living tissues and cells are immersed in liquids (such as blood or culture media), reactive species generated by APPs in the gas phase are transported to the liquid phase and possibly converted to different types of reactive species therein before causing some influence on the tissues or cells. In this study, the rate equations are solved to evaluate concentrations of various reactive species in pure water that are originated by plasma reactions in atmosphere and possible effects of such species (including ROS/RNS) on living tissues and cells are discussed.

  2. Theoretical and experimental studies of a planar inductive coupled rf plasma source as the driver in simulator facility (ISTAPHM) of interactions of waves with the edge plasma on tokamaks

    Science.gov (United States)

    Ghanei, V.; Nasrabadi, M. N.; Chin, O.-H.; Jayapalan, K. K.

    2017-11-01

    This research aims to design and build a planar inductive coupled RF plasma source device which is the driver of the simulator project (ISTAPHM) of the interactions between ICRF Antenna and Plasma on tokamak by using the AMPICP model. For this purpose, a theoretical derivation of the distribution of the RF magnetic field in the plasma-filled reactor chamber is presented. An experimental investigation of the field distributions is described and Langmuir measurements are developed numerically. A comparison of theory and experiment provides an evaluation of plasma parameters in the planar ICP reactor. The objective of this study is to characterize the plasma produced by the source alone. We present the results of the first analysis of the plasma characteristics (plasma density, electron temperature, electron-ion collision frequency, particle fluxes and their velocities, stochastic frequency, skin depth and electron energy distribution functions) as function of the operating parameters (injected power, neutral pressure and magnetic field) as measured with fixed and movable Langmuir probes. The plasma is currently produced only by the planar ICP. The exact goal of these experiments is that the produced plasma by external source can exist as a plasma representative of the edge of tokamaks.

  3. Modeling of polarization phenomena due to RF sheaths and electron beams in magnetized plasma; Modelisation de phenomenes de polarisation par des gaines rf et des faisceaux electroniques dans un plasma magnetise

    Energy Technology Data Exchange (ETDEWEB)

    Faudot, E

    2005-07-01

    This work investigates the problematic of hot spots induced by accelerated particle fluxes in tokamaks. It is shown that the polarization due to sheaths in the edge plasma in which an electron beam at a high level of energy is injected, can reach several hundreds volts and thus extend the deposition area. The notion of obstructed sheath is introduced and explains the acceleration of energy deposition by the decreasing of the sheath potential. Then, a 2-dimensional fluid modeling of flux tubes in front of ICRF antennae allows us to calculate the rectified potentials taking into account RF polarization currents transverse to magnetic field lines. The 2-dimensional fluid code designed validates the analytical results which show that the DC rectified potential is 50% greater with polarization currents than without. Finally, the simultaneous application of an electron beam and a RF potential reveals that the potentials due to each phenomenon are additives when RF potential is much greater than beam polarization. The density depletion of polarized flux tubes in 2-dimensional PIC (particles in cells) simulations is characterized but not yet explained. (author)

  4. Iterative Addition of Kinetic Effects to Cold Plasma RF Wave Solvers

    Science.gov (United States)

    Green, David; Berry, Lee; RF-SciDAC Collaboration

    2017-10-01

    The hot nature of fusion plasmas requires a wave vector dependent conductivity tensor for accurate calculation of wave heating and current drive. Traditional methods for calculating the linear, kinetic full-wave plasma response rely on a spectral method such that the wave vector dependent conductivity fits naturally within the numerical method. These methods have seen much success for application to the well-confined core plasma of tokamaks. However, quantitative prediction of high power RF antenna designs for fusion applications has meant a requirement of resolving the geometric details of the antenna and other plasma facing surfaces for which the Fourier spectral method is ill-suited. An approach to enabling the addition of kinetic effects to the more versatile finite-difference and finite-element cold-plasma full-wave solvers was presented by where an operator-split iterative method was outlined. Here we expand on this approach, examine convergence and present a simplified kinetic current estimator for rapidly updating the right-hand side of the wave equation with kinetic corrections. This research used resources of the Oak Ridge Leadership Computing Facility at the Oak Ridge National Laboratory, which is supported by the Office of Science of the U.S. Department of Energy under Contract No. DE-AC05-00OR22725.

  5. Spatio-temporal powder formation and trapping in RF silane plasmas using 2-D polarization-sensitive laser scattering

    International Nuclear Information System (INIS)

    Dorier, J.L.; Hollenstein, C.; Howling, A.A.

    1994-09-01

    Powder formation studies in deposition plasmas are motivated by the need to reduce contamination in the plasma and films. Models for the force acting upon particles in rf discharges suffer from a lack of quantitative experimental data for comparison in the case of silane-containing plasmas. In this work, a cross-section of the parallel-plate capacitor discharge is illuminated with a polarized beam-expanded laser and global spatio-temporal scattered light and extinction are recorded by CCD cameras. Spatially-regular periodic bright/dark zones due to constructive/destructive Mie interference are visible over large regions of the powder layers, which shows the uniform nature of particle growth in silane plasmas. For particles trapped in an argon plasma, as for steady-state conditions in silane, spatial size segregation is demonstrated by fringes which reverse according to the polarisation of scattered light. The method allow a self-consistent estimation of particle size and number density throughout the discharge volume from which strong particle Coulomb coupling (Γ>40) is suggested to influence powder dynamics. Correction must be made to the plasma emission profile for the extinction by powder. In conclusion, this global diagnostics improves understanding of particle growth and dynamics in silane rf discharges and provides experimental input for testing the validity of models. (author) 6 figs., 43 refs

  6. About of the Electrostatic fields excitation theory by a RF wave in a plasma

    International Nuclear Information System (INIS)

    Gutierrez T, C.R.

    1991-01-01

    In an unidimensional model is shown in the cases of a semi limited plasma and a layer of plasma the excitement mechanism of electrostatic fields for a radiofrequency wave (RF) polarized lineally. This phenomenon depends strongly on the combined action of the Miller force and that of impulsion. It is shown that the action of these forces is carried out in different characteristic times when the front of wave crosses through the plasma. The cases of a semi limited plasma and of a layer of plasma without and with current are analyzed. It is shown that near the frontiers of the plasma where the field is sufficiently big arise oscillations of the width of the field that are slowly muffled in the space in an exponential way. In the cases of a plasma layer its are shown that the processes that arise near the frontier x = L are similar to the processes that arise near the frontier x = 0. The existence of current in the plasma layer leads to the blockade of the excited perturbations in the frontier x = L. (Author)

  7. Atmospheric-pressure-plasma-enhanced fabrication of nonfouling nanocoatings for 316 stainless steel biomaterial interfaces

    Science.gov (United States)

    Huang, Chun; Lin, Jin-He; Li, Chi-Heng; Yu, I.-Chun; Chen, Ting-Lun

    2018-03-01

    Atmospheric-pressure plasma, which was generated with electrical RF power, was fed to a tetramethyldisiloxane/argon gas mixture to prepare bioinert organosilicon coatings for 316 stainless steel. The surface characteristics of atmospheric-pressure-plasma-deposited nanocoatings were evaluated as a function of RF plasma power, precursor gas flow, and plasma working distance. After surface deposition, the chemical features, elemental compositions, and surface morphologies of the organosilicon nanocoatings were examined. It was found that RF plasma power and plasma working distance are the essential factors that affect the formation of plasma-deposited nanocoatings. Fourier transform infrared spectroscopy spectra indicate that the atmospheric-pressure-plasma-deposited nanocoatings formed showed inorganic features. Atomic force microscopy analysis showed the surface roughness variation of the plasma-deposited nanocoating at different RF plasma powers and plasma working distances during surface treatment. From these surface analyses, it was found that the plasma-deposited organosilicon nanocoatings under specific operational conditions have relatively hydrophobic and inorganic characteristics, which are essential for producing an anti-biofouling interface on 316 stainless steel. The experimental results also show that atmospheric-pressure-plasma-deposited nanocoatings have potential use as a cell-resistant layer on 316 stainless steel.

  8. RF-plasma vapor deposition of siloxane on paper. Part 1: Physical evolution of paper surface

    Science.gov (United States)

    Sahin, Halil Turgut

    2013-01-01

    An alternative, new approach to improve the hydrophobicity and barrier properties of paper was evaluated by radio-frequency (RF) plasma octamethylcyclotetrasiloxane (OMCTSO) vapor treatment. The interaction between OMCTSO and paper, causing the increased hydophobicity, is likely through covalent bonding. The deposited thin silicone-like polymeric layer from OMCTSO plasma treatment possessed desirable hydrophobic properties. The SEM micrographs showed uniformly distributed grainy particles with various shapes on the paper surface. Deposition of the silicone polymer-like layer with the plasma treatment affects the distribution of voids in the network structure and increases the barrier against water intake and air. The water absorptivity was reduced by 44% for the OMCTSO plasma treated sheet. The highest resistance to air flow was an approximately 41% lower air permeability than virgin paper.

  9. Filtering peripheral high temperature electrons in a cylindrical rf-driven plasmas by an axisymmetric radial magnetic field

    Science.gov (United States)

    Akahoshi, Hikaru; Takahashi, Kazunori; Ando, Akira

    2018-03-01

    High temperature electrons generated near a radial wall of a cylindrical source tube in a radiofrequency (rf) inductively-coupled plasma is filtered by an axisymmetric radial magnetic field formed near the source exit by locating annular permanent magnets, where the axial magnetic field strength in the radially central region is fairly uniform inside the source tube and is close to zero near the source exit. The source is operated at 3 mTorr in argon and the rf antenna is powered by a 13.56 MHz and 400 W rf generator. Measurement of electron energy probability functions shows the presence of the peripheral high temperature electrons inside the source, while the temperature of the peripheral electrons downstream of the source is observed to be reduced.

  10. Characterization of diamond-like carbon thin film synthesized by RF atmospheric pressure plasma Ar/CH4 jet

    Science.gov (United States)

    Sohbatzadeh, Farshad; Safari, Reza; Etaati, G. Reza; Asadi, Eskandar; Mirzanejhad, Saeed; Hosseinnejad, Mohammad Taghi; Samadi, Omid; Bagheri, Hanieh

    2016-01-01

    The growth of diamond like carbon (DLC) on a Pyrex glass was investigated by a radio frequency (RF) atmospheric pressure plasma jet (APPJ). The plasma jet with capacitive configuration ran by a radio frequency power supply at 13.56 MHz. Alumina ceramic was used as dielectric barrier. Ar and CH4 were used in atmospheric pressure as carrier and precursor gases, respectively. Diamond like carbon thin films were deposited on Pyrex glass at substrate temperature and applied power of 130 °C and 250 Watts, respectively. Performing field emission scanning electron microscope (FE-SEM) and laser Raman spectroscopy analysis resulted in deposition rate and the ID/IG ratio of 21.31 nm/min and 0.47, respectively. The ID/IG ratio indicated that the coating possesses relative high sp3 content The optical emission spectroscopy (OES) diagnostic was applied to diagnose plasma jet species. Estimating electron temperature and density of the RF-APPJ resulted in 1.36 eV and 2.75 × 1014 cm-3 at the jet exit, respectively.

  11. Profiles of plasma parameters and density of negative hydrogen ions by laser detachment measurements in RF-driven ion sources

    International Nuclear Information System (INIS)

    Christ-Koch, Sina

    2007-01-01

    This work shows the application of the Laserdetachment method for spatially resolved measurements of negative Hydrogen/Deuterium ion density. It was applied on a high power low pressure RF-driven ion source. The Laser detachment method is based on the measurement of electron currents on a positively biased Langmuir probe before and during/after a laser pulse. The density ratio of negative ions to electrons can be derived from the ratio of currents to the probe. The absolute density of negative ions can be obtained when the electron density is measured with the standard Langmuir probe setup. Measurements with the Langmuir probe additionally yield information about the floating and plasma potential, the electron temperature and the density of positive ions. The Laser detachment setup had to be adapted to the special conditions of the RF-driven source. In particular the existence of RF fields (1 MHz), high source potential (-20 kV), magnetic fields (∝ 7 mT) and caesium inside the source had to be considered. The density of negative ions could be identified in the range of n(H - )=1.10 17 1/m 3 , which is in the same order of magnitude as the electron density. Only the application of the Laser detachment method with the Langmuir probe measurements will yield spatially resolved plasma parameters and H- density profiles. The influence of diverse external parameters, such as pressure, RF-power, magnetic fields on the plasma parameters and their profiles were studied and explained. Hence, the measurements lead to a detailed understanding of the processes inside the source. (orig.)

  12. How to increase the hydrophobicity of PTFE surfaces using an r.f. atmospheric-pressure plasma torch

    NARCIS (Netherlands)

    Carbone, E.A.D.; Boucher, N.; Sferrazza, M.; Reniers, F.

    2010-01-01

    An experimental investigation of the surface modification of polytetrafluoroethylene (PTFE) by an Ar and Ar/O2 plasma created with an atmospheric-pressure radio frequency (r.f.) torch is presented here. The surfaces were analyzed by atomic force microscopy (AFM), XPS and water contact angle (WCA) to

  13. Modeling of polarization phenomena due to RF sheaths and electron beams in magnetized plasma

    International Nuclear Information System (INIS)

    Faudot, E.

    2005-01-01

    This work investigates the problematic of hot spots induced by accelerated particle fluxes in tokamaks. It is shown that the polarization due to sheaths in the edge plasma in which an electron beam at a high level of energy is injected, can reach several hundreds volts and thus extend the deposition area. The notion of obstructed sheath is introduced and explains the acceleration of energy deposition by the decreasing of the sheath potential. Then, a 2-dimensional fluid modeling of flux tubes in front of ICRF antennae allows us to calculate the rectified potentials taking into account RF polarization currents transverse to magnetic field lines. The 2-dimensional fluid code designed validates the analytical results which show that the DC rectified potential is 50% greater with polarization currents than without. Finally, the simultaneous application of an electron beam and a RF potential reveals that the potentials due to each phenomenon are additives when RF potential is much greater than beam polarization. The density depletion of polarized flux tubes in 2-dimensional PIC (particles in cells) simulations is characterized but not yet explained. (author)

  14. Basic study on the generation of RF plasmas in premixed oxy-combustion with methane

    International Nuclear Information System (INIS)

    Osaka, Yugo; Razzak, M.A.; Kobayashi, Noriyuki; Ohno, Noriyasu; Takamura, Shuichi; Uesugi, Yoshihiko

    2010-01-01

    Oxy-combustion generates a high temperature field (above 3000 K), which is applied to next generation power plants and high temperature industrial technologies because of N 2 free processes. However, the combustion temperature is so high that the furnace wall may be fatally damaged. In addition, it is very difficult to control the heat flux and chemical species' concentrations because of rapid chemical reactions. We have developed a new method for controlling the flame by electromagnetic force on this field. In this paper, we experimentally investigated the power coupling between the premixed oxy-combustion with methane and radio frequency (RF) power through the induction coil. By optimizing the power coupling, we observed that the flame can absorb RF power up to 1.5 kW. Spectroscopic measurements also showed an increase in the emission intensity from OH radicals in the flame, indicating improved combustibility. (author)

  15. Metal doped fluorocarbon polymer films prepared by plasma polymerization using an RF planar magnetron target

    International Nuclear Information System (INIS)

    Biederman, H.; Holland, L.

    1983-01-01

    Fluorocarbon films have been prepared by plasma polymerization of CF 4 using an RF planar magnetron with an aluminium target. More than one order of magnitude higher deposition rate has been achieved in comparison with an r.f. diode system operated under similar conditions of monomer pressure and flow rate and power input. A glow discharge in a CF 4 [25%]-argon[75%] mixture was used to incorporate aluminium from a target electrode into the polymer films. The foregoing mixture and another based on CF 4 [87%]-argon[13%] were used in the RF discharge with a copper target. Some experiments with a gold target and pure CF 4 as the inlet gas were also made. The film structure was examined by SEM and TEM and characteristic micrographs are presented here. The composition of the films was estimated from an EAS study. The sheet resistivity of the metal/polymer film complexes was determined. (orig.)

  16. Metal doped fluorocarbon polymer films prepared by plasma polymerization using an RF planar magnetron target

    Energy Technology Data Exchange (ETDEWEB)

    Biederman, H.; Holland, L. (Sussex Univ., Brighton (UK). Lab. for Plasma Materials Processing)

    1983-07-01

    Fluorocarbon films have been prepared by plasma polymerization of CF/sub 4/ using an RF planar magnetron with an aluminium target. More than one order of magnitude higher deposition rate has been achieved in comparison with an R.F. diode system operated under similar conditions of monomer pressure and flow rate and power input. A glow discharge in a CF/sub 4/(25%)-argon(75%) mixture was used to incorporate aluminium from a target electrode into the polymer films. The foregoing mixture and another based on CF/sub 4/(87%)-argon(13%) were used in the RF discharge with a copper target. Some experiments with a gold target and pure CF/sub 4/ as the inlet gas were also made. The film structure was examined by SEM and TEM and characteristic micrographs are presented here. The composition of the films was estimated from an EAS study. The sheet resistivity of the metal/polymer film complexes was determined.

  17. CoPt/TiN films nanopatterned by RF plasma etching towards dot-patterned magnetic media

    Science.gov (United States)

    Szívós, János; Pothorszky, Szilárd; Soltys, Jan; Serényi, Miklós; An, Hongyu; Gao, Tenghua; Deák, András; Shi, Ji; Sáfrán, György

    2018-03-01

    CoPt thin films as possible candidates for Bit Patterned magnetic Media (BPM) were prepared and investigated by electron microscopy techniques and magnetic measurements. The structure and morphology of the Direct Current (DC) sputtered films with N incorporation were revealed in both as-prepared and annealed state. Nanopatterning of the samples was carried out by means of Radio Frequency (RF) plasma etching through a Langmuir-Blodgett film of silica nanospheres that is a fast and high throughput technique. As a result, the samples with hexagonally arranged 100 nm size separated dots of fct-phase CoPt were obtained. The influence of the order of nanopatterning and anneling on the nanostructure formation was revealed. The magnetic properties of the nanopatterned fct CoPt films were investigated by Vibrating Sample Magnetometer (VSM) and Magnetic Force Microscopy (MFM). The results show that CoPt thin film nanopatterned by means of the RF plasma etching technique is promising candidate to a possible realization of BPM. Furthermore, this technique is versatile and suitable for scaling up to technological and industrial applications.

  18. The characteristics of RF modulated plasma boundary sheaths: An analysis of the standard sheath model

    Science.gov (United States)

    Naggary, Schabnam; Brinkmann, Ralf Peter

    2015-09-01

    The characteristics of radio frequency (RF) modulated plasma boundary sheaths are studied on the basis of the so-called ``standard sheath model.'' This model assumes that the applied radio frequency ωRF is larger than the plasma frequency of the ions but smaller than that of the electrons. It comprises a phase-averaged ion model - consisting of an equation of continuity (with ionization neglected) and an equation of motion (with collisional ion-neutral interaction taken into account) - a phase-resolved electron model - consisting of an equation of continuity and the assumption of Boltzmann equilibrium -, and Poisson's equation for the electrical field. Previous investigations have studied the standard sheath model under additional approximations, most notably the assumption of a step-like electron front. This contribution presents an investigation and parameter study of the standard sheath model which avoids any further assumptions. The resulting density profiles and overall charge-voltage characteristics are compared with those of the step-model based theories. The authors gratefully acknowledge Efe Kemaneci for helpful comments and fruitful discussions.

  19. Study on the RF inductively coupled plasma spheroidization of refractory W and W-Ta alloy powders

    Science.gov (United States)

    Chenfan, YU; Xin, ZHOU; Dianzheng, WANG; Neuyen VAN, LINH; Wei, LIU

    2018-01-01

    Spherical powders with good flowability and high stacking density are mandatory for powder bed additive manufacturing. Nevertheless, the preparation of spherical refractory tungsten and tungsten alloy powders is a formidable task. In this paper, spherical refractory metal powders processed by high-energy stir ball milling and RF inductively coupled plasma were investigated. By utilizing the technical route, pure spherical tungsten powders were prepared successfully, the flowability increased from 10.7 s/50 g to 5.5 s/50 g and apparent density increased from 6.916 g cm-3 to 11.041 g cm-3. Alloying element tantalum can reduce the tendency to micro-crack during tungsten laser melting and rapid solidification process. Spherical W-6Ta (%wt) powders were prepared in this way, homogeneous dispersion of tantalum in a tungsten matrix occurred but a small amount of flake-like shape particles appeared after high-energy stir ball milling. The flake-like shape particles can hardly be spheroidized in subsequent RF inductively coupled plasma process, might result from the unique suspended state of flaky particles under complex electric and magnetic fields as well as plasma-particle heat exchange was different under various turbulence models. As a result, the flake-like shape particles cannot pass through the high-temperature area of thermal plasma torch and cannot be spheroidized properly.

  20. Measurement of ion temperature and flow in RF start-up plasmas in TST-2 and LATE

    International Nuclear Information System (INIS)

    Tsuda, Shintaro; Ejiri, Akira; Takase, Yuichi; Tsujii, Naoto; Takeuchi, Toshihiro; Tanaka, Hitoshi; Uchida, Masaki; Maekawa, Takashi

    2015-01-01

    The ion temperature and flow of RF start-up plasmas in TST-2 and LATE were measured using a visible spectrometer. The plasma currents were 9 kA and 8 kA, respectively. The typical ion temperatures T i and toroidal flow V ϕ were 4 eV and 1 km/s, respectively, in the TST-2 plasma sustained by the lower hybrid wave (20 kW) and T i ∼ 10 eV and V ϕ ∼ 5 km/s in the LATE plasma sustained by the electron cyclotron wave (50 kW). The poloidal flow velocities were comparable to the toroidal velocities. The ion temperatures were relatively high and the ion orbit loss can be significant. (author)

  1. Wetting, Solubility and Chemical Characteristics of Plasma-Polymerized 1-Isopropyl-4-Methyl-1,4-Cyclohexadiene Thin Films

    Directory of Open Access Journals (Sweden)

    Jakaria Ahmad

    2014-07-01

    Full Text Available Investigations on the wetting, solubility and chemical composition of plasma polymer thin films provide an insight into the feasibility of implementing these polymeric materials in organic electronics, particularly where wet solution processing is involved. In this study, thin films were prepared from 1-isopropyl-4-methyl-1,4-cyclohexadiene (γ-Terpinene using radio frequency (RF plasma polymerization. FTIR showed the polymers to be structurally dissimilar to the original monomer and highly cross-linked, where the loss of original functional groups and the degree of cross-linking increased with deposition power. The polymer surfaces were hydrocarbon-rich, with oxygen present in the form of O–H and C=O functional groups. The oxygen content decreased with deposition power, with films becoming more hydrophobic and, thus, less wettable. The advancing and receding contact angles were investigated, and the water advancing contact angle was found to increase from 63.14° to 73.53° for thin films prepared with an RF power of 10 W to 75 W. The wetting envelopes for the surfaces were constructed to enable the prediction of the surfaces’ wettability for other solvents. The effect of roughness on the wetting behaviour of the films was insignificant. The polymers were determined to resist solubilization in solvents commonly used in the deposition of organic semiconducting layers, including chloroform and chlorobenzene, with higher stability observed in films fabricated at higher RF power.

  2. The effect of applied electric field on pulsed radio frequency and pulsed direct current plasma jet array

    International Nuclear Information System (INIS)

    Hu, J. T.; Liu, X. Y.; Liu, J. H.; Xiong, Z. L.; Liu, D. W.; Lu, X. P.; Iza, F.; Kong, M. G.

    2012-01-01

    Here we compare the plasma plume propagation characteristics of a 3-channel pulsed RF plasma jet array and those of the same device operated by a pulsed dc source. For the pulsed-RF jet array, numerous long life time ions and metastables accumulated in the plasma channel make the plasma plume respond quickly to applied electric field. Its structure similar as “plasma bullet” is an anode glow indeed. For the pulsed dc plasma jet array, the strong electric field in the vicinity of the tube is the reason for the growing plasma bullet in the launching period. The repulsive forces between the growing plasma bullets result in the divergence of the pulsed dc plasma jet array. Finally, the comparison of 309 nm and 777 nm emissions between these two jet arrays suggests the high chemical activity of pulsed RF plasma jet array.

  3. Filtering peripheral high temperature electrons in a cylindrical rf-driven plasmas by an axisymmetric radial magnetic field

    Directory of Open Access Journals (Sweden)

    Hikaru Akahoshi

    2018-03-01

    Full Text Available High temperature electrons generated near a radial wall of a cylindrical source tube in a radiofrequency (rf inductively-coupled plasma is filtered by an axisymmetric radial magnetic field formed near the source exit by locating annular permanent magnets, where the axial magnetic field strength in the radially central region is fairly uniform inside the source tube and is close to zero near the source exit. The source is operated at 3 mTorr in argon and the rf antenna is powered by a 13.56 MHz and 400 W rf generator. Measurement of electron energy probability functions shows the presence of the peripheral high temperature electrons inside the source, while the temperature of the peripheral electrons downstream of the source is observed to be reduced.

  4. RF plasma deposition of thin Si{sub x}Ge{sub y}C{sub z}:H films using a combination of organometallic source materials

    Energy Technology Data Exchange (ETDEWEB)

    Rapiejko, C. [Institute for Materials Science and Engineering, Technical University of LodzLz Stefanowskiego 1, 90-924 Lodz (Poland); Gazicki-Lipman, M. [Institute for Materials Science and Engineering, Technical University of LodzLz Stefanowskiego 1, 90-924 Lodz (Poland)]. E-mail: gazickim@p.lodz.pl; Klimek, L. [Institute for Materials Science and Engineering, Technical University of LodzLz Stefanowskiego 1, 90-924 Lodz (Poland); Szymanowski, H. [Institute for Materials Science and Engineering, Technical University of LodzLz Stefanowskiego 1, 90-924 Lodz (Poland); Strojek, M. [Institute for Materials Science and Engineering, Technical University of LodzLz Stefanowskiego 1, 90-924 Lodz (Poland)

    2004-12-22

    Elements of the IV group of periodic table have been strongly present in the fast development of PECVD techniques for the last two decades at least. As a result, deposition technologies of such materials as a-Si:H, a-C:H, m{mu}-C:H or DLC have been successfully established. What has followed is an ever growing interest in binary systems of the A{sub x}(IV)B{sub y}(IV):H kind. One possible way to deposit such systems is to use organosilicon compounds (to deposit Si{sub x}C{sub y}:H films) or organogermanium compounds (to deposit Ge{sub x}C{sub y}:H films), as source substances. The present paper reports on a RF plasma deposition of a Si{sub x}Ge{sub y}C{sub z}:H ternary system, using a combination of organosilicon and organogermanium compounds. Thin Si/Ge/C films have been fabricated in a small volume (ca. 2 dm{sup 3}) parallel plate RF plasma reactor using, as a source material, a combination of tetramethylsilane (TMS) and tetramethylgermanium (TMG) vapours carried by argon. SEM investigations reveal a continuous compact character of the coatings and their uniform thickness. The elemental composition of the films has been studied using EDX analysis. The results of the analysis show that the elemental composition of the films can be controlled by both the TMG/TMS ratio of the initial mixture and the RF power input. Ellipsometric measurements show good homogeneity of these materials. Chemical bonding in the films has been studied using the FTIR technique. Bandgap calculations have been carried out using ellipsometric data and by applying both the Tauc law and the Moss approach.

  5. Decontamination of chemical and biological warfare (CBW) agents using an atmospheric pressure plasma jet (APPJ)

    Science.gov (United States)

    Herrmann, H. W.; Henins, I.; Park, J.; Selwyn, G. S.

    1999-05-01

    The atmospheric pressure plasma jet (APPJ) [A. Schütze et al., IEEE Trans. Plasma Sci. 26, 1685 (1998)] is a nonthermal, high pressure, uniform glow plasma discharge that produces a high velocity effluent stream of highly reactive chemical species. The discharge operates on a feedstock gas (e.g., He/O2/H2O), which flows between an outer, grounded, cylindrical electrode and an inner, coaxial electrode powered at 13.56 MHz rf. While passing through the plasma, the feedgas becomes excited, dissociated or ionized by electron impact. Once the gas exits the discharge volume, ions and electrons are rapidly lost by recombination, but the fast-flowing effluent still contains neutral metastable species (e.g., O2*, He*) and radicals (e.g., O, OH). This reactive effluent has been shown to be an effective neutralizer of surrogates for anthrax spores and mustard blister agent. Unlike conventional wet decontamination methods, the plasma effluent does not cause corrosion and it does not destroy wiring, electronics, or most plastics, making it highly suitable for decontamination of sensitive equipment and interior spaces. Furthermore, the reactive species in the effluent rapidly degrade into harmless products leaving no lingering residue or harmful by-products.

  6. MESSENGER Spacecraft Phase Scintillation due to Plasma ductting effect on RF beam propagation at Superior Solar Conjunction

    Science.gov (United States)

    Mosavi, N.; Sequeira, H.; Copeland, D.; Menyuk, C.

    2017-12-01

    We investigate the evolution of a radio frequency (RF) X-band signal as it propagates through the solar corona turbulence in superior solar conjunction at low Sun-Earth-Probe (SEP) angles.Data that was obtained during several MESSENGER (MErcury Surface, Space ENivornment, GEochmeisty, and Ranging) conjunctions reveal a short-term and long-term effect. Amplitude scintillation is evident on a short time scale. Phase scintillations are stronger, but occur over a longer time scale. We examine different possible phenomena in the solar plasma that could be the source of the different time scales of the amplitude and phase scintillations. We propose a theoretical model in which the amplitude scintillations are due to local fluctuations of the index of refraction that scatter the RF signal. These rapidly varying fluctuations randomly attenuate the signal without affecting its phase. By contrast, we propose a model in which phase fluctuations are due to long ducts in the solar plasma, streaming from the sun, that trap some parts of the RF signal. These ducts act as waveguides, changing the phase velocity of the RF beam as it travels a zigzag path inside a duct. When the radiated wave exits from a duct, its phase is changed with respect to the signal that did not pass through the duct, which can lead to destructive interference and carrier suppression. The trapping of the wave is random in nature and can be either a fast or slow process. The predictions of this model are consistent with observations.

  7. Charge plasma based source/drain engineered Schottky Barrier MOSFET: Ambipolar suppression and improvement of the RF performance

    Science.gov (United States)

    Kale, Sumit; Kondekar, Pravin N.

    2018-01-01

    This paper reports a novel device structure for charge plasma based Schottky Barrier (SB) MOSFET on ultrathin SOI to suppress the ambipolar leakage current and improvement of the radio frequency (RF) performance. In the proposed device, we employ dual material for the source and drain formation. Therefore, source/drain is divided into two parts as main source/drain and source/drain extension. Erbium silicide (ErSi1.7) is used as main source/drain material and Hafnium metal is used as source/drain extension material. The source extension induces the electron plasma in the ultrathin SOI body resulting reduction of SB width at the source side. Similarly, drain extension also induces the electron plasma at the drain side. This significantly increases the SB width due to increased depletion at the drain end. As a result, the ambipolar leakage current can be suppressed. In addition, drain extension also reduces the parasitic capacitances of the proposed device to improve the RF performance. The optimization of length and work function of metal used in the drain extension is performed to achieve improvement in device performance. Moreover, the proposed device makes fabrication simpler, requires low thermal budget and free from random dopant fluctuations.

  8. RF Sheath-Enhanced Plasma Surface Interaction Studies using Beryllium Optical Emission Spectroscopy in JET ITER-Like Wall

    Energy Technology Data Exchange (ETDEWEB)

    Agarici, G. [Fusion for Energy (F4E), Barcelona, Spain; Klepper, C Christopher [ORNL; Colas, L. [French Atomic Energy Commission (CEA); Krivska, Alena [Ecole Royale Militaire, Brussels Belgium; Bobkov, V. [Max-Planck-Institut fur Plasmaphysik, EURATOM Association, Garching, Germany; Jacquet, P. [Culham Centre for Fusion Energy (CCFE), Abingdon, UK; Delabie, Ephrem G. [ORNL; Giroud, C. [EURATOM / UKAEA, UK; Kirov, K K. [Association EURATOM-CCFE, Abingdon, UK; Lasa Esquisabel, Ane [ORNL; Lerche, E. [ERM-KMS, Association EURATOM-Belgian State, Brussels, Belgium; Dumortier, P. [ERM-KMS, Association EURATOM-Belgian State, Brussels, Belgium; Durodie, Frederic [Ecole Royale Militaire, Brussels Belgium

    2017-10-01

    A dedicated study on JET-ILW, deploying two types of ICRH antennas and spectroscopic observation spots at two outboard, beryllium limiters, has provided insight on long-range (up to 6m) RFenhanced plasma-surface interactions (RF-PSI) due to near-antenna electric fields. To aid in the interpretation of optical emission measurements of these effects, the antenna near-fields are computed using the TOPICA code, specifically run for the ITER-like antenna (ILA); similar modelling already existed for the standard JET antennas (A2). In the experiment, both antennas were operated in current drive mode, as RF-PSI tends to be higher in this phasing and at similar power (∼0.5 MW). When sweeping the edge magnetic field pitch angle, peaked RF-PSI effects, in the form of 2-4 fold increase in the local Be source,are consistently measured with the observation spots magnetically connect to regions of TOPICAL-calculated high near-fields, particularly at the near-antenna limiters. It is also found that similar RF-PSI effects are produced by the two types of antenna on similarly distant limiters. Although this mapping of calculated near-fields to enhanced RF-PSI gives only qualitative interpretion of the data, the present dataset is expected to provide a sound experimental basis for emerging RF sheath simulation model validation.

  9. Heteroepitaxial Growth of Germanium-on-Silicon Using Ultrahigh-Vacuum Chemical Vapor Deposition with RF Plasma Enhancement

    Science.gov (United States)

    Alharthi, Bader; Grant, Joshua M.; Dou, Wei; Grant, Perry C.; Mosleh, Aboozar; Du, Wei; Mortazavi, Mansour; Li, Baohua; Naseem, Hameed; Yu, Shui-Qing

    2018-05-01

    Germanium (Ge) films have been grown on silicon (Si) substrate by ultrahigh-vacuum chemical vapor deposition with plasma enhancement (PE). Argon plasma was generated using high-power radiofrequency (50 W) to assist in germane decomposition at low temperature. The growth temperature was varied in the low range of 250°C to 450°C to make this growth process compatible with complementary metal-oxide-semiconductor technology. The material and optical properties of the grown Ge films were investigated. The material quality was determined by Raman and x-ray diffraction techniques, revealing growth of crystalline films in the temperature range of 350°C to 450°C. Photoluminescence spectra revealed improved optical quality at growth temperatures of 400°C and 450°C. Furthermore, material quality study using transmission electron microscopy revealed existence of defects in the Ge layer grown at 400°C. Based on the etch pit density, the average threading dislocation density in the Ge layer obtained at this growth temperature was measured to be 4.5 × 108 cm-2. This result was achieved without any material improvement steps such as use of graded buffer or thermal annealing. Comparison between PE and non-plasma-enhanced growth, in the same machine at otherwise the same growth conditions, indicated increased growth rate and improved material and optical qualities for PE growth.

  10. Measurement of plasma-surface energy fluxes in an argon rf-discharge by means of calorimetric probes and fluorescent microparticles

    International Nuclear Information System (INIS)

    Maurer, H. R.; Kersten, H.; Hannemann, M.; Basner, R.

    2010-01-01

    Measured energy influx densities toward a tungsten dummy substrate in an argon rf-plasma are presented and a model for the description of the energy influx density based on plasma parameters, which have been obtained by Langmuir probe measurements, is applied. Furthermore, temperature measurements of microparticles are presented, which are confined in the plasma sheath. An extension of the model is developed for the description of the energy influx density to the particles. The comparison of model and experimental results offer the possibility to obtain an improved understanding of plasma-surface interactions.

  11. RF torch discharge combined with conventional burner

    International Nuclear Information System (INIS)

    Janca, J.; Tesar, C.

    1996-01-01

    The design of the combined flame-rf-plasma reactor and experimental examination of this reactor are presented. For the determination of the temperature in different parts of the combined burner plasma the methods of emission spectroscopy were used. The temperatures measured in the conventional burner reach the maximum temperature 1900 K but in the burner with the superimposed rf discharge the neutral gas temperature substantially increased up to 2600 K but also the plasma volume increases substantially. Consequently, the resident time of reactants in the reaction zone increases

  12. Battery-Powered RF Pre-Ionization System for the Caltech Magnetohydrodynamically-Driven Jet Experiment: RF Discharge Properties and MHD-Driven Jet Dynamics

    Science.gov (United States)

    Chaplin, Vernon H.

    This thesis describes investigations of two classes of laboratory plasmas with rather different properties: partially ionized low pressure radiofrequency (RF) discharges, and fully ionized high density magnetohydrodynamically (MHD)-driven jets. An RF pre-ionization system was developed to enable neutral gas breakdown at lower pressures and create hotter, faster jets in the Caltech MHD-Driven Jet Experiment. The RF plasma source used a custom pulsed 3 kW 13.56 MHz RF power amplifier that was powered by AA batteries, allowing it to safely float at 4-6 kV with the cathode of the jet experiment. The argon RF discharge equilibrium and transport properties were analyzed, and novel jet dynamics were observed. Although the RF plasma source was conceived as a wave-heated helicon source, scaling measurements and numerical modeling showed that inductive coupling was the dominant energy input mechanism. A one-dimensional time-dependent fluid model was developed to quantitatively explain the expansion of the pre-ionized plasma into the jet experiment chamber. The plasma transitioned from an ionizing phase with depressed neutral emission to a recombining phase with enhanced emission during the course of the experiment, causing fast camera images to be a poor indicator of the density distribution. Under certain conditions, the total visible and infrared brightness and the downstream ion density both increased after the RF power was turned off. The time-dependent emission patterns were used for an indirect measurement of the neutral gas pressure. The low-mass jets formed with the aid of the pre-ionization system were extremely narrow and collimated near the electrodes, with peak density exceeding that of jets created without pre-ionization. The initial neutral gas distribution prior to plasma breakdown was found to be critical in determining the ultimate jet structure. The visible radius of the dense central jet column was several times narrower than the axial current channel

  13. Spatially resolved ozone densities and gas temperatures in a time modulated RF driven atmospheric pressure plasma jet: an analysis of the production and destruction mechanisms

    International Nuclear Information System (INIS)

    Zhang Shiqiang; Van Gessel, Bram; Hofmann, Sven; Van Veldhuizen, Eddie; Bruggeman, Peter; Van Gaens, Wouter; Bogaerts, Annemie

    2013-01-01

    In this work, a time modulated RF driven DBD-like atmospheric pressure plasma jet in Ar + 2%O 2 , operating at a time averaged power of 6.5 W is investigated. Spatially resolved ozone densities and gas temperatures are obtained by UV absorption and Rayleigh scattering, respectively. Significant gas heating in the core of the plasma up to 700 K is found and at the position of this increased gas temperature a depletion of the ozone density is found. The production and destruction reactions of O 3 in the jet effluent as a function of the distance from the nozzle are obtained from a zero-dimensional chemical kinetics model in plug flow mode which considers relevant air chemistry due to air entrainment in the jet fluent. A comparison of the measurements and the models show that the depletion of O 3 in the core of the plasma is mainly caused by an enhanced destruction of O 3 due to a large atomic oxygen density. (paper)

  14. Hydrogen retention in carbon-tungsten co-deposition layer formed by hydrogen RF plasma

    International Nuclear Information System (INIS)

    Katayama, K.; Kawasaki, T.; Manabe, Y.; Nagase, H.; Takeishi, T.; Nishikawa, M.

    2006-01-01

    Carbon-tungsten co-deposition layers (C-W layers) were formed by sputtering method using hydrogen or deuterium RF plasma. The deposition rate of the C-W layer by deuterium plasma was faster than that by hydrogen plasma, where the increase of deposition rate of tungsten was larger than that of carbon. This indicates that the isotope effect on sputtering-depositing process for tungsten is larger than that for carbon. The release curve of hydrogen from the C-W layer showed two peaks at 400 deg. C and 700 deg. C. Comparing the hydrogen release from the carbon deposition layer and the tungsten deposition layer, it is considered that the increase of the release rate at 400 deg. C is affected by tungsten and that at 700 deg. C is affected by carbon. The obtained hydrogen retention in the C-W layers which have over 60 at.% of carbon was in the range between 0.45 and 0.16 as H/(C + W)

  15. Influence of operating parameters on surface properties of RF glow discharge oxygen plasma treated TiO{sub 2}/PET film for biomedical application

    Energy Technology Data Exchange (ETDEWEB)

    Pandiyaraj, K. Navaneetha, E-mail: dr.knpr@gmail.com [Surface Engineering Laboratory, Department of Physics, Sri Shakthi Institute of Engineering and Technology, L and T by pass, Chinniyam Palayam (post), Coimbatore 641062 (India); Deshmukh, R.R. [Department of Physics, Institute of Chemical Technology, Matunga, Mumbai 400 019 (India); Mahendiran, R. [Surface Engineering Laboratory, Department of Physics, Sri Shakthi Institute of Engineering and Technology, L and T by pass, Chinniyam Palayam (post), Coimbatore 641062 (India); Su, Pi-G [Department of Chemistry, Chinese Culture University, Taipei 111, Taiwan (China); Yassitepe, Emre; Shah, Ismat [Department of Physics and Astronomy, Department of Materials Science and Engineering, University of Delaware, 208 Dupont Hall, Newark (United States); Perni, Stefano [School of Pharmacy and Pharmaceutical Sciences, Cardiff University, Cardiff (United Kingdom); Prokopovich, Polina [School of Pharmacy and Pharmaceutical Sciences, Cardiff University, Cardiff (United Kingdom); Institute of Medical Engineering and Medical Physics, School of Engineering, Cardiff University (United Kingdom); Nadagouda, Mallikarjuna N., E-mail: Nadagouda.Mallikarjuna@epamail.epa.gov [The U.S. Environmental Protection Agency, ORD, NRMRL, WSWRD, 26W. Martin Luther King Drive, Cincinnati, OH 45268 (United States)

    2014-03-01

    In this paper, a thin transparent titania (TiO{sub 2}) film was coated on the surface of flexible poly(ethylene terephthalate) (PET) film using the sol–gel method. The surface properties of the obtained TiO{sub 2}/PET film were further improved by RF glow discharge oxygen plasma as a function of exposure time and discharge power. The changes in hydrophilicity of TiO{sub 2}/PET films were analyzed by contact angle measurements and surface energy. The influence of plasma on the surface of the TiO{sub 2}/PET films was analyzed by atomic force microscopy (AFM) as well as the change in chemical state and composition that were investigated by X-ray photo electron spectroscopy (XPS). The cytotoxicity of the TiO{sub 2}/PET films was analyzed using human osteoblast cells and the bacterial eradication behaviors of TiO{sub 2}/PET films were also evaluated against Staphylococcus bacteria. It was found that the surface roughness and incorporation of oxygen containing polar functional groups of the plasma treated TiO{sub 2}/PET films increased substantially as compared to the untreated one. Moreover the increased concentration of Ti{sup 3+} on the surface of plasma treated TiO{sub 2}/PET films was due to the transformation of chemical states (Ti{sup 4+} → Ti{sup 3+}). These morphological and chemical changes are responsible for enhanced hydrophilicity of the TiO{sub 2}/PET films. Furthermore, the plasma treated TiO{sub 2}/PET film exhibited no citotoxicity against osteoblast cells and antibacterial activity against Staphylococcus bacteria which can find application in manufacturing of biomedical devices. - Graphical abstract: Mechanism of plasma treatment on the surface of TiO{sub 2}/PET films. - Highlights: • Investigated the surface properties of TiO{sub 2}/PET films modified by O{sub 2} plasma • Studied the effect of operating parameters on surface properties of TiO{sub 2}/PET films • Mechanism of the plasma treatment on TiO{sub 2}/PET was clearly investigated.

  16. Effects of RF plasma treatment on spray-pyrolyzed copper oxide films on silicon substrates

    Science.gov (United States)

    Madera, Rozen Grace B.; Martinez, Melanie M.; Vasquez, Magdaleno R., Jr.

    2018-01-01

    The effects of radio-frequency (RF) argon (Ar) plasma treatment on the structural, morphological, electrical and compositional properties of the spray-pyrolyzed p-type copper oxide films on n-type (100) silicon (Si) substrates were investigated. The films were successfully synthesized using 0.3 M copper acetate monohydrate sprayed on precut Si substrates maintained at 350 °C. X-ray diffraction revealed cupric oxide (CuO) with a monoclinic structure. An apparent improvement in crystallinity was realized after Ar plasma treatment, attributed to the removal of residues contaminating the surface. Scanning electron microscope images showed agglomerated monoclinic grains and revealed a reduction in size upon plasma exposure induced by the sputtering effect. The current-voltage characteristics of CuO/Si showed a rectifying behavior after Ar plasma exposure with an increase in turn-on voltage. Four-point probe measurements revealed a decrease in sheet resistance after plasma irradiation. Fourier transform infrared spectral analyses also showed O-H and C-O bands on the films. This work was able to produce CuO thin films via spray pyrolysis on Si substrates and enhancement in their properties by applying postdeposition Ar plasma treatment.

  17. RF plasma production and heating below ion-cyclotron frequencies in Uragan torsatrons

    International Nuclear Information System (INIS)

    Moiseenko, V.E.; Berezhnyj, V.L.; Bondarenko, V.N.; Burchenko, P.Ya.; Chechkin, V.V.; Chernyshenko, V.Ya.; Dreval, M.B.; Garkusha, I.E.; Glazunov, G.P.; Grigor'eva, L.I.; Konovalov, V.G.; Kotsubanov, V.D.; Kramskoi, Ye.D.; Kulaga, A.E.; Lozin, A.V.; Castejon, F.; Hidalgo, C.; Hartmann, D.; Koch, R.; Lyssoivan, A.I.

    2011-01-01

    In the IPP-Kharkiv there are two torsatrons (stellarators) in operation, and in both of them Alfven resonance heating under high-k || conditions is used. This method of heating is advantageous for small-size devices, since in contrast to the minority and second-harmonic heating it can be realized at lower plasma densities. A series of experiments has been performed at the Uragan-3M torsatron with an aim to investigate the features of the discharge with a three-half-turn antenna. Electron temperatures in the T-bar = 0.2-0.5 keV range are achieved at plasma densities n-bar e approx. (0.5-1.5) x 10 13 cm -3 . The plasma energy content has increased by a factor of 2 with respect to the plasma produced with the frame antenna. A new four-strap shielded antenna has been manufactured and installed in the Uragan-2M. A high-frequency discharge for wall conditioning is introduced in the Uragan-2M torsatron. The discharge is sustained by a specially designed small frame antenna, and efficient hydrogen dissociation is achieved. A self-consistent model has been developed for simulation of plasma production in ICRF. The model includes a set of particle and energy-balance equations for the electrons, and the boundary problem for the Maxwell equations. The first calculation results on RF plasma production in the Uragan-2M stellarator with the frame-type antenna are presented.

  18. TiO2 thin and thick films grown on Si/glass by sputtering of titanium targets in an RF inductively coupled plasma

    International Nuclear Information System (INIS)

    Valencia-Alvarado, R; López-Callejas, R; Mercado-Cabrera, A; Peña-Eguiluz, R; Muñoz-Castro, A E; Rodríguez-Méndez, B G; De la Piedad-Beneitez, A; De la Rosa-Vázquez, J M

    2015-01-01

    TiO 2 thin and thick films were deposited on silicon/glass substrates using RF inductive plasma in continuous wave. The films thickness, as well as phases control, is achieved with a gradual increase in temperature substrates varying supplied RF power or working gas pressure besides deposition time as well. The deposition conditions were: argon 80%/oxygen 20% carefully calibrated mixture of 2 to 7×10 −2 mbar as working gas pressure range. Deposition time 0.5 to 5 hours, 500 or 600 W RF power at 13.56 MHz frequency and 242-345 °C substrates temperature range. The titanium dioxide deposited on the substrates is grown by sputtering of a titanium target negatively polarized at 3-5 kV DC situated 14 mm in front of such substrates. The plasma reactor is a simple Pyrex-like glass cylindrical vessel of 50 cm long and 20 cm in diameter. Using the before describe plasma parameters we obtained films only anatase and both anatase/rutile phases with stoichiometric different. The films were characterized by X-ray photoelectron spectroscopy (XPS), stylus profilometer, X-ray diffraction (XRD), scanning electron microscopy (SEM) and Raman spectroscopy. (paper)

  19. Detailed Numerical Simulation of Single-Walled Carbon Nanotube Synthesis in a Radio-Frequency Induction Thermal Plasma System

    International Nuclear Information System (INIS)

    Esfarjani, S Arabzadeh; Mostaghimi, J; Dworkin, S B; Kim, K S; Kingston, C T; Simard, B; Soucy, G

    2012-01-01

    2D axisymmetric numerical calculations are conducted to model the thermo-fluid fields and chemical reactions leading to the formation of SWCNTs in an RF plasma system. A modified version of the SWCNT “reduced” chemical model is used to estimate the formation of SWCNT in an RF plasma system for the first time. The “reduced” model incorporates 14 species and 36 chemical reactions to predict the formation of metal and carbon clusters and SWCNTs. By combing the chemistry model into the RF plasma CFD code, the formation and development of carbon and metal catalyst clusters and their reactions which produce SWCNTs are shown. The chemistry model is shown to under-predict the yield rate of SWCNT. In order to better predict the yield rate, a sensitivity analysis is performed to modify the dominant reaction rates. The modified model predicts the yield of SWCNTs correctly within the range reported experimentally. However, more studies should be conducted to validate the accuracy of the model for different operating conditions.

  20. Tungsten Deposition on Graphite using Plasma Enhanced Chemical Vapour Deposition

    International Nuclear Information System (INIS)

    Sharma, Uttam; Chauhan, Sachin S; Sharma, Jayshree; Sanyasi, A K; Ghosh, J; Choudhary, K K; Ghosh, S K

    2016-01-01

    The tokamak concept is the frontrunner for achieving controlled thermonuclear reaction on earth, an environment friendly way to solve future energy crisis. Although much progress has been made in controlling the heated fusion plasmas (temperature ∼ 150 million degrees) in tokamaks, technological issues related to plasma wall interaction topic still need focused attention. In future, reactor grade tokamak operational scenarios, the reactor wall and target plates are expected to experience a heat load of 10 MW/m 2 and even more during the unfortunate events of ELM's and disruptions. Tungsten remains a suitable choice for the wall and target plates. It can withstand high temperatures, its ductile to brittle temperature is fairly low and it has low sputtering yield and low fuel retention capabilities. However, it is difficult to machine tungsten and hence usages of tungsten coated surfaces are mostly desirable. To produce tungsten coated graphite tiles for the above-mentioned purpose, a coating reactor has been designed, developed and made operational at the SVITS, Indore. Tungsten coating on graphite has been attempted and successfully carried out by using radio frequency induced plasma enhanced chemical vapour deposition (rf -PECVD) for the first time in India. Tungsten hexa-fluoride has been used as a pre-cursor gas. Energy Dispersive X-ray spectroscopy (EDS) clearly showed the presence of tungsten coating on the graphite samples. This paper presents the details of successful operation and achievement of tungsten coating in the reactor at SVITS. (paper)

  1. Decontamination of chemical and biological warfare (CBW) agents using an atmospheric pressure plasma jet (APPJ)

    International Nuclear Information System (INIS)

    Herrmann, H.W.; Henins, I.; Park, J.; Selwyn, G.S.

    1999-01-01

    The atmospheric pressure plasma jet (APPJ) [A. Schuetze et al., IEEE Trans. Plasma Sci. 26, 1685 (1998)] is a nonthermal, high pressure, uniform glow plasma discharge that produces a high velocity effluent stream of highly reactive chemical species. The discharge operates on a feedstock gas (e.g., He/O 2 /H 2 O), which flows between an outer, grounded, cylindrical electrode and an inner, coaxial electrode powered at 13.56 MHz rf. While passing through the plasma, the feedgas becomes excited, dissociated or ionized by electron impact. Once the gas exits the discharge volume, ions and electrons are rapidly lost by recombination, but the fast-flowing effluent still contains neutral metastable species (e.g., O 2 * , He * ) and radicals (e.g., O, OH). This reactive effluent has been shown to be an effective neutralizer of surrogates for anthrax spores and mustard blister agent. Unlike conventional wet decontamination methods, the plasma effluent does not cause corrosion and it does not destroy wiring, electronics, or most plastics, making it highly suitable for decontamination of sensitive equipment and interior spaces. Furthermore, the reactive species in the effluent rapidly degrade into harmless products leaving no lingering residue or harmful by-products. copyright 1999 American Institute of Physics

  2. Study of effect of grain size on dust charging in an RF plasma using three-dimensional PIC-MCC simulations

    International Nuclear Information System (INIS)

    Ikkurthi, V. R.; Melzer, A.; Matyash, K.; Schneider, R.

    2008-01-01

    A 3-dimensional Particle-Particle Particle-Mesh (P 3 M) code is applied to study the charging process of micrometer size dust grains confined in a capacitive RF discharge. In our model, particles (electrons and ions) are treated kinetically (Particle-in-Cell with Monte Carlo Collisions (PIC-MCC)). In order to accurately resolve the plasma particles' motion close to the dust grain, the PIC technique is supplemented with Molecular Dynamics (MD), employing an an analytic electrostatic potential for the interaction with the dust grain. This allows to self-consistently resolve the dust grain charging due to absorption of plasma electrons and ions. The charging of dust grains confined above lower electrode in a capacitive RF discharge and its dependence on the size and position of the dust is investigated. The results have been compared with laboratory measurements

  3. ICH antenna development on the ORNL RF Test Facility

    International Nuclear Information System (INIS)

    Gardner, W.L.; Bigelow, T.S.; Haste, G.R.; Hoffman, D.J.; Livesey, R.L.

    1987-01-01

    A compact resonant loop antenna is installed on the ORNL Radio Frequency Test Facility (RFTF). Facility characteristics include a steady-state magnetic field of ∼ 0.5 T at the antenna, microwave-generated plasmas with n e ∼ 10 12 cm -3 and T e ∼ 8 eV, and 100 kW of 25-MHz rf power. The antenna is tunable from ∼22--75 MHz, is designed to handle ≥1 MW of rf power, and can be moved 5 cm with respect to the port flange. Antenna characteristics reported and discussed include the effect of magnetic field on rf voltage breakdown at the capacitor, the effects of magnetic field and plasma on rf voltage breakdown between the radiating element and the Faraday shield, the effects of graphite on Faraday shield losses, and the efficiency of coupling to the plasma. 2 refs., 4 figs

  4. Synthesis and characterization of Al2O3 and SiO2 films with fluoropolymer content using rf-plasma magnetron sputtering technique

    International Nuclear Information System (INIS)

    Islam, Mohammad; Inal, Osman T.

    2008-01-01

    Pure and molecularly mixed inorganic films for protection against atomic oxygen in lower earth orbit were prepared using radio-frequency (rf) plasma magnetron sputtering technique. Alumina (Al 2 O 3 ) and silica (SiO 2 ) films with average grain size in the range of 30-80 nm and fully dense or dense columnar structure were synthesized under different conditions of pressure and power. Simultaneous oxide sputtering and plasma polymerization (PP) of hexafluoropropylene (HFP) led to the formation of molecularly mixed films with fluoropolymer content. The degree of plasma polymerization was strongly influenced by total chamber pressure and the argon to HFP molar ratio (n Ar /n M ). An order of magnitude increase in pressure due to argon during codeposition changed the plasma-polymerization mechanism from radical-chain- to radical-radical-type processes. Subsequently, a shift from linear CH 2 group based chain polymerization to highly disordered fluoropolymer content with branching and cross-linking was observed. Fourier transform infrared spectroscopy studies revealed chemical interaction between depositing SiO 2 and PP-HFP through appearance of absorption bands characteristic of Si-F stretching and expansion of SiO 2 network. The relative amount and composition of plasma-polymerized fluoropolymer in such films can be controlled by changing argon to HFP flow ratio, total chamber pressure, and applied power. These films offer great potential for use as protective coatings in aerospace applications

  5. Electron Heating Mode Transitions in Nitrogen (13.56 and 40.68) MHz RF-CCPs

    Science.gov (United States)

    Erozbek Gungor, Ummugul; Bilikmen, Sinan Kadri; Akbar, Demiral

    2015-09-01

    Capacitively coupled radio frequency plasmas (RF-CCPs) are commonly used in plasma material processing. Parametrical structure of the plasma determines the demands of processing applications. For example; high density plasmas in gamma mode are mostly preferred for etching applications while stabile plasmas in gamma mode are usually used in sputtering applications. For this reason, characterization of the plasma is very essential before surface modification of the materials. In this work, analysis of electron heating mode transition in high frequency (40.68 MHz) RF-CCP was deeply investigated. The plasma was generated in a home-made (500 × 400 mm2) stainless steel cylindrical reactor in which two identical (200 mm in diameter) electrodes were placed with 40 mm interval. In addition, L-type automatic matching network system was connected to the 40.68 MHz RF generator to get high accuracy. Moreover, the pure (99.995 %) nitrogen was used as an activation gas on account of having an appreciable impression in plasma processing applications. Furthermore, diagnostic measurements of the plasma were done by using the Impedans Langmuir single and double probe systems. It was found that two transition points; α- γ (pressure dependent) and γ- α (RF power dependent) were observed in both medium and high RF-CCPs. As a result, the α- γ pressure transition increased, whereas the γ- α power transition remained constant by changing the RF frequency sources.

  6. A study of the performance and properties of diamond like carbon (DLC) coatings deposited by plasma chemical vapor deposition (CVD) for two stroke engine components

    Energy Technology Data Exchange (ETDEWEB)

    Tither, D. [BEP Grinding Ltd., Manchester (United Kingdom); Ahmed, W.; Sarwar, M.; Penlington, R. [Univ. of Northumbria, Newcastle-upon-Tyne (United Kingdom)

    1995-12-31

    Chemical vapor deposition (CVD) using microwave and RF plasma is arguably the most successful technique for depositing diamond and diamond like carbon (DLC) films for various engineering applications. However, the difficulties of depositing diamond are nearly as extreme as it`s unique combination of physical, chemical and electrical properties. In this paper, the modified low temperature plasma enhanced CVD system is described. The main focus of this paper will be work related to deposition of DLC on metal matrix composite materials (MMCs) for application in two-stroke engine components and results will be presented from SEM, mechanical testing and composition analysis studies. The authors have demonstrated the feasibility of depositing DLC on MMCs for the first time using a vacuum deposition process.

  7. RF plasma-driven hydrogen permeation through a biased iron membrane

    International Nuclear Information System (INIS)

    Banno, T.; Waelbroeck, F.; Winter, J.

    1984-01-01

    The steady-state RF plasma-driven hydrogen permeation through an electrically biased iron membrane has been investigated as a function of the bias potential Vsub(M) for membrane temperatures in the range of 150-400 0 C. Vsub(M) has been gradually increased positively from the floating potential of the membrane. The permeation flux decreases when Vsub(M) increases at low voltages: positive hydrogen ions are repelled. The membrane temperature does not influence this effect measurably. The permeation flux starts to increase when Vsub(M) is raised higher, i.e. when energetic electrons strike the surface. This phenomenon shows a pronounced temperature dependence - the enhancement is largest for the lowest temperatures. The effect is interpreted in terms of an electron-induced dissociation of hydrogen molecules on the membrane surface. (orig.)

  8. Formation Of Carbon Oxides In CH4/O2 Plasmas Produced By Inductively Coupled RF Discharges At Low Pressure

    International Nuclear Information System (INIS)

    Moeller, Ivonne; Soltwisch, Henning

    2003-01-01

    The formation of CO and CO2 has been studied in inductively coupled rf (13.56 MHz) discharges with varied mixtures of CH4 and O2 as feed gases at a total pressure of 10 Pa, flow rates of <10 sccm, and input powers of <500 W. The primary diagnostic tool has been TDLAS (tunable diode laser absorption spectroscopy) to measure absolute concentrations of molecular species as well as their kinetic and rovibrational temperatures. Of particular interest is the sudden transition between different modes of power coupling (capacitive and inductive mode, resp.) and the related changes of the plasma composition. We have found that the power threshold for this transition exhibits a clear hysteresis and depends on the oxygen content. Comparing the ratio of the CO- and CO2-concentrations in capacitive mode with corresponding data from a parallel-plate discharge, clear differences have been observed. The findings can partly be explained on the basis of plasma-chemical reaction chains using tabulated cross-sections in combination with estimations of the electron energy distribution function. Some observations (as, e.g. the presence of CO in inductively coupled plasmas that are fed by pure oxygen) cannot be understood from volume reactions only but point to an important role of surface processes, which depend on the materials of the discharge chamber and on its history and cleaning method

  9. Contact glow discharge electrolysis: its origin, plasma diagnostics and non-faradaic chemical effects

    International Nuclear Information System (INIS)

    Sen Gupta, Susanta K

    2015-01-01

    Contact glow discharge electrolysis (CGDE) also termed plasma electrolysis is a novel electrolysis where a stable sheath of light emitting plasma develops around an electrode immersed well inside a relatively high-conductivity liquid electrolyte during normal electrolysis (NE) at several hundred volts. The phenomenon may develop in dc-, pulsed dc-, ac- as well as RF-driven electrolyses. The chemical effects of CGDE are remarkably non-faradaic in respect to the nature of the products as well as their yields. The article traces comprehensively the progress made in studies of CGDE in aqueous and non-aqueous solutions since 1844 and reviews the developments in the understanding of its origin, light emission, plasma state and non-faradaic effects leading to the elucidation of detailed mechanism of the origin of CGDE on the basis of the onset of hydrodynamic instabilities in local vaporization of the solvent near the working electrode during NE, and that of highly non-faradaic effects of CGDE based on a model of two reaction zones located within the electrode plasma and at the plasma–liquid interface producing solvent derived radicals at high local concentrations. Keeping in view the recent surge of interest in varied applications of CGDE, the article is appended with highlights of these applications across synthetic chemistry, waste water treatment, electrosurgical devices, nanoparticle fabrications, surface engineering and micro-machining. (topical review)

  10. High-density plasma etching characteristics of indium-gallium-zinc oxide thin films in CF4/Ar plasma

    International Nuclear Information System (INIS)

    Joo, Young-Hee; Kim, Chang-Il

    2015-01-01

    We investigated the etching process of indium-gallium-zinc oxide (IGZO) thin films in an inductively coupled plasma system. The dry etching characteristics of the IGZO thin films were studied by varying the CF 4 /Ar gas mixing ratio, RF power, DC-bias voltage, and process pressure. We determined the following optimized process conditions: an RF power of 700 W, a DC-bias voltage of − 150 V, and a process pressure of 2 Pa. A maximum etch rate of 25.63 nm/min for the IGZO thin films was achieved in a plasma with CF 4 /Ar(= 25:75), and the selectivity of IGZO to Al and TiN was found to be 1.3 and 0.7, respectively. We determined the ionic composition of the CF 4 /Ar plasma using optical emission spectroscopy. Analysis of chemical reactions at the IGZO thin film surfaces was performed using X-ray photoelectron spectroscopy. - Highlights: • IGZO thin film was etched by CF 4 /Ar plasma as a function of gas mixing ratio. • IGZO bonds were broken Ar + sputtering and then reacted with the C-F x radicals. • The physical sputtering is dominant in etch control compared with chemical etching

  11. Low temperature RF plasma nitriding of self-organized TiO2 nanotubes for effective bandgap reduction

    Science.gov (United States)

    Bonelli, Thiago Scremin; Pereyra, Inés

    2018-06-01

    Titanium dioxide is a widely studied semiconductor material found in many nanostructured forms, presenting very interesting properties for several applications, particularly photocatalysis. TiO2 nanotubes have a high surface-to-volume ratio and functional electronic properties for light harvesting. Despite these manifold advantages, TiO2 photocatalytic activity is limited to UV radiation due to its large band gap. In this work, TiO2 nanotubes produced by electrochemical anodization were submitted to plasma nitriding processes in a PECVD reactor. The plasma parameters were evaluated to find the best conditions for gap reduction, in order to increase their photocatalytic activity. The pressure and RF power density were varied from 0.66 to 2.66 mbar and 0.22 to 3.51 W/cm2 respectively. The best gap reduction, to 2.80 eV, was achieved using a pressure of 1.33 mbar and 1.75 W/cm2 RF power at 320 °C, during a 2-h process. This leads to a 14% reduction in the band gap value and an increase of 25.3% in methylene blue reduction, doubling the range of solar photons absorption from 5 to 10% of the solar spectrum.

  12. RF study and 3-D simulations of a side-coupling thermionic RF-gun

    International Nuclear Information System (INIS)

    Rimjaem, S.; Kusoljariyakul, K.; Thongbai, C.

    2014-01-01

    A thermionic RF-gun for generating ultra-short electron bunches was optimized, developed and used as a source at a linac-based THz radiation research laboratory of the Plasma and Beam Physics Research Facility, Chiang Mai University, Thailand. The RF-gun is a π/2-mode standing wave structure, which consists of two S-band accelerating cells and a side-coupling cavity. The 2856 MHz RF wave is supplied from an S-band klystron to the gun through the waveguide input-port at the cylindrical wall of the second cell. A fraction of the RF power is coupled from the second cell to the first one via a side-coupling cavity. Both the waveguide input-port and the side-coupling cavity lead to an asymmetric geometry of the gun. RF properties and electromagnetic field distributions inside the RF-gun were studied and numerically simulated by using computer codes SUPERFISH 7.19 and CST Microwave Studio 2012 © . RF characterizations and tunings of the RF-gun were performed to ensure the reliability of the gun operation. The results from 3D simulations and measurements are compared and discussed in this paper. The influence of asymmetric field distributions inside the RF-gun on the electron beam properties was investigated via 3D beam dynamics simulations. A change in the coupling-plane of the side-coupling cavity is suggested to improve the gun performance

  13. RF study and 3-D simulations of a side-coupling thermionic RF-gun

    Science.gov (United States)

    Rimjaem, S.; Kusoljariyakul, K.; Thongbai, C.

    2014-02-01

    A thermionic RF-gun for generating ultra-short electron bunches was optimized, developed and used as a source at a linac-based THz radiation research laboratory of the Plasma and Beam Physics Research Facility, Chiang Mai University, Thailand. The RF-gun is a π/2-mode standing wave structure, which consists of two S-band accelerating cells and a side-coupling cavity. The 2856 MHz RF wave is supplied from an S-band klystron to the gun through the waveguide input-port at the cylindrical wall of the second cell. A fraction of the RF power is coupled from the second cell to the first one via a side-coupling cavity. Both the waveguide input-port and the side-coupling cavity lead to an asymmetric geometry of the gun. RF properties and electromagnetic field distributions inside the RF-gun were studied and numerically simulated by using computer codes SUPERFISH 7.19 and CST Microwave Studio 2012©. RF characterizations and tunings of the RF-gun were performed to ensure the reliability of the gun operation. The results from 3D simulations and measurements are compared and discussed in this paper. The influence of asymmetric field distributions inside the RF-gun on the electron beam properties was investigated via 3D beam dynamics simulations. A change in the coupling-plane of the side-coupling cavity is suggested to improve the gun performance.

  14. RF power dependent formation of amorphous MoO3-x nanorods by RF magnetron sputtering

    International Nuclear Information System (INIS)

    Navas, I.; Vinodkumar, R.; Detty, A.P.; Mahadevan Pillai, V.P.

    2009-01-01

    Full text: The fabrication of nanorods has received increasing attention for their unique physical and chemical properties and a wide range of potential applications such as photonics and nanoelectronics Molybdenum oxide nanorods with high activity can be used in a wide variety of applications such as cathodes in rechargeable batteries, field emission devices, solid lubricants, superconductors thermoelectric materials, and electrochromic devices. In this paper, amorphous MoO 3-x nanorods can find excellent applications in electrochromic and gas sensing have been successfully prepared by varying the R F power in R F Magnetron Sputtering system without heating the substrate; other parameters which are optimised in our earlier studies. We have found that the optimum RF power for nanorod formation is 200W. At a moderate RF power (200W), sputtering redeposition takes places constructively which leads to formation of fine nanorods. Large RF power creates high energetic ion bombardment on the grains surfaces which can lead to re-nucleation, so the grains become smaller and columnar growth is interrupted. Beyond the RF power 200W, the etching effect of the plasma became more severe and damaged the surface of the nanorods. All the molybdenum oxide films prepared are amorphous; the XRD patterns exhibit no characteristic peak corresponds to MoO 3 . The amorphous nature is preferred for good electrochromic colouration The spectroscopic properties of the nanorods have been investigated systematically using atomic force microscopy, x-ray diffraction, micro-Raman, UV-visible and photoluminescence (PL) spectroscopy. The films exhibit two emission bands; a near band edge UV emission and a defect related deep level visible emission

  15. Characterization of thin TiO2 films prepared by plasma enhanced chemical vapour deposition for optical and photocatalytic applications

    International Nuclear Information System (INIS)

    Sobczyk-Guzenda, A.; Gazicki-Lipman, M.; Szymanowski, H.; Kowalski, J.; Wojciechowski, P.; Halamus, T.; Tracz, A.

    2009-01-01

    Thin titanium oxide films were deposited using a radio frequency (RF) plasma enhanced chemical vapour deposition method. Their optical properties and thickness were determined by means of ultraviolet-visible absorption spectrophotometry. Films of the optical parameters very close to those of titanium dioxide have been obtained at the high RF power input. Their optical quality is high enough to allow for their use in a construction of stack interference optical filters. At the same time, these materials exhibit strong photocatalytic effects. The results of structural analysis, carried out by Raman Shift Spectroscopy, show that the coatings posses amorphous structure. However, Raman spectra of the same films subjected to thermal annealing at 450 o C disclose an appearance of a crystalline form, namely that of anatase. Surface morphology of the films has also been characterized by Atomic Force Microscopy revealing granular, broccoli-like topography of the films.

  16. Development of multi-channel high power rectangular RF window for LHCD system employing high temperature vacuum brazing technique

    International Nuclear Information System (INIS)

    Sharma, P K; Ambulkar, K K; Parmar, P R; Virani, C G; Thakur, A L; Joshi, L M; Nangru, S C

    2010-01-01

    A 3.7 GHz., 120 kW (pulsed), lower hybrid current drive (LHCD) system is employed to drive non-inductive plasma current in ADITYA tokamak. The rf power is coupled to the plasma through grill antenna and is placed in vacuum environment. A vacuum break between the pressurized transmission line and the grill antenna is achieved with the help of a multi (eight) channel rectangular RF vacuum window. The phasing between adjacent channels of 8-channel window (arranged in two rows) is important for launching lower hybrid waves and each channel should have independent vacuum window so that phase information is retained. The geometrical parameter of the grill antenna, like periodicity (9mm), channel dimensions (cross sectional dimension of 76mm x 7mm), etc. is to be maintained. These design constraint demanded a development of a multi channel rectangular RF vacuum window. To handle rf losses and thermal effects, high temperature vacuum brazing techniques is desired. Based on the above requirements we have successfully developed a multi channel rectangular rf vacuum window employing high temperature vacuum brazing technique. During the development process we could optimize the chemical processing parameters, brazing process parameters, jigs and fixtures for high temperature brazing and leak testing, etc. Finally the window is tested for low power rf performance using VNA. In this paper we would present the development of the said window in detail along with its mechanical, vacuum and rf performances.

  17. Development of multi-channel high power rectangular RF window for LHCD system employing high temperature vacuum brazing technique

    Energy Technology Data Exchange (ETDEWEB)

    Sharma, P K; Ambulkar, K K; Parmar, P R; Virani, C G; Thakur, A L [Institute for Plasma Research, Bhat, Gandhinagar 382428 (India); Joshi, L M; Nangru, S C, E-mail: pramod@ipr.res.i [Central Electronics Engineering Research Institute, Pilani, Rajasthan 333 031 (India)

    2010-02-01

    A 3.7 GHz., 120 kW (pulsed), lower hybrid current drive (LHCD) system is employed to drive non-inductive plasma current in ADITYA tokamak. The rf power is coupled to the plasma through grill antenna and is placed in vacuum environment. A vacuum break between the pressurized transmission line and the grill antenna is achieved with the help of a multi (eight) channel rectangular RF vacuum window. The phasing between adjacent channels of 8-channel window (arranged in two rows) is important for launching lower hybrid waves and each channel should have independent vacuum window so that phase information is retained. The geometrical parameter of the grill antenna, like periodicity (9mm), channel dimensions (cross sectional dimension of 76mm x 7mm), etc. is to be maintained. These design constraint demanded a development of a multi channel rectangular RF vacuum window. To handle rf losses and thermal effects, high temperature vacuum brazing techniques is desired. Based on the above requirements we have successfully developed a multi channel rectangular rf vacuum window employing high temperature vacuum brazing technique. During the development process we could optimize the chemical processing parameters, brazing process parameters, jigs and fixtures for high temperature brazing and leak testing, etc. Finally the window is tested for low power rf performance using VNA. In this paper we would present the development of the said window in detail along with its mechanical, vacuum and rf performances.

  18. Cold plasmas

    International Nuclear Information System (INIS)

    Franz, G.

    1990-01-01

    This textbook discusses the following topics: Phenomenological description of a direct current glow discharge; the plasma (temperature distribution and measurement, potential variation, electron energy distribution function, charge neutralization, wall potentials, plasma oscillations); Production of charge carriers (ions, electrons, ionization in the cathode zone, negative glowing zone, Faraday dark space, positive column, anode zone, hollow cathode discharges); RF-discharges (charge carrier production, RF-Shields, scattering mechanisms); Sputtering (ion-surface interaction, kinetics, sputtering yield and energy distribution, systems and conditions, film formation and stresses, contamination, bias techniques, multicomponent film deposition, cohesion, magnetrons, triode systems, plasma enhanced chemical vapor deposition); Dry etching (sputter etching, reactive etching, topography, process control, quantitative investigations); Etching mechanisms (etching of Si and SiO 2 with CF 4 , of III/V-compound-semiconductors, combination of isotrope and anisotrope etching methods, surface cleaning); ion beam systems (applications, etching); Dyclotron-resonance-systems (electron cyclotron resonance systems, whistler-sources and 'resonant inductive plasma etching'); Appendix (electron energy distribution functions, Bohm's transition zone, plasma oscillations, scattering cross sections and mean free path, metastable states, Child-Langmuir-Schottky equation, loss mechanisms, charge carrier distribution in the positive column, breakdown at high frequencies, motion in a magnetic field, skin depth of an electric field for a HF-discharge, whistler waves, dispersion relations for plane wave propagation). (orig.) With 138 figs

  19. Application of new simulation algorithms for modeling rf diagnostics of electron clouds

    International Nuclear Information System (INIS)

    Veitzer, Seth A.; Smithe, David N.; Stoltz, Peter H.

    2012-01-01

    Traveling wave rf diagnostics of electron cloud build-up show promise as a non-destructive technique for measuring plasma density and the efficacy of mitigation techniques. However, it is very difficult to derive an absolute measure of plasma density from experimental measurements for a variety of technical reasons. Detailed numerical simulations are vital in order to understand experimental data, and have successfully modeled build-up. Such simulations are limited in their ability to reproduce experimental data due to the large separation of scales inherent to the problem. Namely, one must resolve both rf frequencies in the GHz range, as well as the plasma modulation frequency of tens of MHz, while running for very long simulations times, on the order of microseconds. The application of new numerical simulation techniques allow us to bridge the simulation scales in this problem and produce spectra that can be directly compared to experiments. The first method is to use a plasma dielectric model to measure plasma-induced phase shifts in the rf wave. The dielectric is modulated at a low frequency, simulating the effects of multiple bunch crossings. This allows simulations to be performed without kinetic particles representing the plasma, which both speeds up the simulations as well as reduces numerical noise from interpolation of particle charge and currents onto the computational grid. Secondly we utilize a port boundary condition model to simultaneously absorb rf at the simulation boundaries, and to launch the rf into the simulation. This method improves the accuracy of simulations by restricting rf frequencies better than adding an external (finite) current source to drive rf, and absorbing layers at the boundaries. We also explore the effects of non-uniform plasma densities on the simulated spectra.

  20. rf driven multicusp H- ion source

    International Nuclear Information System (INIS)

    Leung, K.N.; DeVries, G.J.; DiVergilio, W.F.; Hamm, R.W.; Hauck, C.A.; Kunkel, W.B.; McDonald, D.S.; Williams, M.D.

    1991-01-01

    An rf driven multicusp source capable of generating 1-ms H - beam pulses with a repetition rate as high as 150 Hz has been developed. This source can be operated with a filament or other types of starter. There is almost no lifetime limitation and a clean plasma can be maintained for a long period of operation. It is demonstrated that rf power as high as 25 kW could be coupled inductively to the plasma via a glass-coated copper-coil antenna. The extracted H - current density achieved is about 200 mA/cm 2

  1. Highly ordered amorphous silicon-carbon alloys obtained by RF PECVD

    CERN Document Server

    Pereyra, I; Carreno, M N P; Prado, R J; Fantini, M C A

    2000-01-01

    We have shown that close to stoichiometry RF PECVD amorphous silicon carbon alloys deposited under silane starving plasma conditions exhibit a tendency towards c-Si C chemical order. Motivated by this trend, we further explore the effect of increasing RF power and H sub 2 dilution of the gaseous mixtures, aiming to obtain the amorphous counterpart of c-Si C by the RF-PECVD technique. Doping experiments were also performed on ordered material using phosphorus and nitrogen as donor impurities and boron and aluminum as acceptor ones. For nitrogen a doping efficiency close to device quality a-Si:H was obtained, the lower activation energy being 0,12 eV with room temperature dark conductivity of 2.10 sup - sup 3 (OMEGA.cm). Nitrogen doping efficiency was higher than phosphorous for all studied samples. For p-type doping, results indicate that, even though the attained conductivity values are not device levels, aluminum doping conducted to a promising shift in the Fermi level. Also, aluminum resulted a more efficie...

  2. High-density plasma etching characteristics of indium-gallium-zinc oxide thin films in CF{sub 4}/Ar plasma

    Energy Technology Data Exchange (ETDEWEB)

    Joo, Young-Hee; Kim, Chang-Il

    2015-05-29

    We investigated the etching process of indium-gallium-zinc oxide (IGZO) thin films in an inductively coupled plasma system. The dry etching characteristics of the IGZO thin films were studied by varying the CF{sub 4}/Ar gas mixing ratio, RF power, DC-bias voltage, and process pressure. We determined the following optimized process conditions: an RF power of 700 W, a DC-bias voltage of − 150 V, and a process pressure of 2 Pa. A maximum etch rate of 25.63 nm/min for the IGZO thin films was achieved in a plasma with CF{sub 4}/Ar(= 25:75), and the selectivity of IGZO to Al and TiN was found to be 1.3 and 0.7, respectively. We determined the ionic composition of the CF{sub 4}/Ar plasma using optical emission spectroscopy. Analysis of chemical reactions at the IGZO thin film surfaces was performed using X-ray photoelectron spectroscopy. - Highlights: • IGZO thin film was etched by CF{sub 4}/Ar plasma as a function of gas mixing ratio. • IGZO bonds were broken Ar{sup +} sputtering and then reacted with the C-F{sub x} radicals. • The physical sputtering is dominant in etch control compared with chemical etching.

  3. On improved understanding of plasma-chemical processes in complex low-temperature plasmas

    Science.gov (United States)

    Röpcke, Jürgen; Loffhagen, Detlef; von Wahl, Eric; Nave, Andy S. C.; Hamann, Stephan; van Helden, Jean-Piere H.; Lang, Norbert; Kersten, Holger

    2018-05-01

    Over the last years, chemical sensing using optical emission spectroscopy (OES) in the visible spectral range has been combined with methods of mid infrared laser absorption spectroscopy (MIR-LAS) in the molecular fingerprint region from 3 to 20 μm, which contains strong rotational-vibrational absorption bands of a large variety of gaseous species. This optical approach established powerful in situ diagnostic tools to study plasma-chemical processes of complex low-temperature plasmas. The methods of MIR-LAS enable to detect stable and transient molecular species in ground and excited states and to measure the concentrations and temperatures of reactive species in plasmas. Since kinetic processes are inherent to discharges ignited in molecular gases, high time resolution on sub-second timescales is frequently desired for fundamental studies as well as for process monitoring in applied research and industry. In addition to high sensitivity and good temporal resolution, the capacity for broad spectral coverage enabling multicomponent detection is further expanding the use of OES and MIR-LAS techniques. Based on selected examples, this paper reports on recent achievements in the understanding of complex low-temperature plasmas. Recently, a link with chemical modeling of the plasma has been provided, which is the ultimate objective for a better understanding of the chemical and reaction kinetic processes occurring in the plasma. Contribution to the Topical Issue "Fundamentals of Complex Plasmas", edited by Jürgen Meichsner, Michael Bonitz, Holger Fehske, Alexander Piel.

  4. RF ion source development for neutral beam application

    International Nuclear Information System (INIS)

    Leung, K.N.; Ehlers, K.W.; Kippenhan, D.; Vella, M.C.

    1983-11-01

    At Lawrence Berkeley Laboratory, a 24 x 24 cm 2 RF source has been tested with beam acceleration. Recently, we have been investigating the characteristics of plasmas generated with different kinds of antenna coatings. The antenna coil was installed inside a cylindrical multicusp source (20-cm diam by 24-cm long) and was driven by a 500 W amplifier. A tiny light bulb filament was used to start a background plasma. The RF was then switched on and a steady-state hydrogen plasma of moderate density (n approx. = 10 11 /cm 3 ) could be sustained even with the filament turned off

  5. Multilayered metal oxide thin film gas sensors obtained by conventional and RF plasma-assisted laser ablation

    International Nuclear Information System (INIS)

    Mitu, B.; Marotta, V.; Orlando, S.

    2006-01-01

    Multilayered thin films of In 2 O 3 and SnO 2 have been deposited by conventional and RF plasma-assisted reactive pulsed laser ablation, with the aim to evaluate their behaviour as toxic gas sensors. The depositions have been carried out by a frequency doubled Nd-YAG laser (λ = 532 nm, τ = 7 ns) on Si(1 0 0) substrates, in O 2 atmosphere. The thin films have been characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and electrical resistance measurements. A comparison of the electrical response of the simple (indium oxide, tin oxide) and multilayered oxides to toxic gas (nitric oxide, NO) has been performed. The influence on the structural and electrical properties of the deposition parameters, such as substrate temperature and RF power is reported

  6. Redefinition of the self-bias voltage in a dielectrically shielded thin sheath RF discharge

    Science.gov (United States)

    Ho, Teck Seng; Charles, Christine; Boswell, Rod

    2018-05-01

    In a geometrically asymmetric capacitively coupled discharge where the powered electrode is shielded from the plasma by a layer of dielectric material, the self-bias manifests as a nonuniform negative charging in the dielectric rather than on the blocking capacitor. In the thin sheath regime where the ion transit time across the powered sheath is on the order of or less than the Radiofrequency (RF) period, the plasma potential is observed to respond asymmetrically to extraneous impedances in the RF circuit. Consequently, the RF waveform on the plasma-facing surface of the dielectric is unknown, and the behaviour of the powered sheath is not easily predictable. Sheath circuit models become inadequate for describing this class of discharges, and a comprehensive fluid, electrical, and plasma numerical model is employed to accurately quantify this behaviour. The traditional definition of the self-bias voltage as the mean of the RF waveform is shown to be erroneous in this regime. Instead, using the maxima of the RF waveform provides a more rigorous definition given its correlation with the ion dynamics in the powered sheath. This is supported by a RF circuit model derived from the computational fluid dynamics and plasma simulations.

  7. Energy confinement in the torsatron URAGAN-3M during the rf-heating mode

    International Nuclear Information System (INIS)

    Pashnev, V.K.; Burchenko, P.Ya.; Lozin, A.V. and others

    2008-01-01

    Energy confinement time of plasma in torsatron U-3M was measured both during quasi-stationary study of RF-discharge and after RF-power cut-off. Power absorbed by plasma in the confinement region was estimated. A mechanism which explain the plasma density behavior in the confinement region is proposed

  8. RF study and 3-D simulations of a side-coupling thermionic RF-gun

    Energy Technology Data Exchange (ETDEWEB)

    Rimjaem, S., E-mail: sakhorn.rimjaem@cmu.ac.th [Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Thailand Center of Excellence in Physics (ThEP), Commission on Higher Education, Bangkok 10400 (Thailand); Kusoljariyakul, K.; Thongbai, C. [Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Thailand Center of Excellence in Physics (ThEP), Commission on Higher Education, Bangkok 10400 (Thailand)

    2014-02-01

    A thermionic RF-gun for generating ultra-short electron bunches was optimized, developed and used as a source at a linac-based THz radiation research laboratory of the Plasma and Beam Physics Research Facility, Chiang Mai University, Thailand. The RF-gun is a π/2-mode standing wave structure, which consists of two S-band accelerating cells and a side-coupling cavity. The 2856 MHz RF wave is supplied from an S-band klystron to the gun through the waveguide input-port at the cylindrical wall of the second cell. A fraction of the RF power is coupled from the second cell to the first one via a side-coupling cavity. Both the waveguide input-port and the side-coupling cavity lead to an asymmetric geometry of the gun. RF properties and electromagnetic field distributions inside the RF-gun were studied and numerically simulated by using computer codes SUPERFISH 7.19 and CST Microwave Studio 2012{sup ©}. RF characterizations and tunings of the RF-gun were performed to ensure the reliability of the gun operation. The results from 3D simulations and measurements are compared and discussed in this paper. The influence of asymmetric field distributions inside the RF-gun on the electron beam properties was investigated via 3D beam dynamics simulations. A change in the coupling-plane of the side-coupling cavity is suggested to improve the gun performance.

  9. Design and RF test result of High Power Hybrid Combiner for Helicon Wave Current Drive in KSTAR Plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Park, S. Y.; Kim, H. J.; Wi, H. H.; Wang, S. J.; Kwak, J. G. [NFRI, Daejeon (Korea, Republic of)

    2016-05-15

    200 kW RF power will be injected to plasmas through the traveling wave antenna after combining four klystrons output powers using three hybrid combiners. Each klystron produces 60 kW output at the frequency of 500 MHz. RF power combiners commonly used to divide or combine output powers for various rf and microwave applications. It is divided into several types according to the design type such as Wilkinson combiner, radial and quadrature hybrid combiner. We designed high power hybrid combiners using 6-1/8 inch coaxial line. The power combiner has many advantages such as high isolation, low insertion loss and high power handling capability. In this paper design and rf test results of high power combiners will be described. High power combiners using three coaxial hybrid couplers will be utilized for effectively combining of 500 MHz, 200 kW output powers generated by four klystrons. We have designed, fabricated, and tested a 6-1/8 inch coaxial hybrid combiners at 500 MHz for efficiently off-axis Helicon wave current drive in KSTAR. Simulation and test results of high power coaxial hybrid combiners are good agreement.

  10. Plasmas for the low-temperature growth of high-quality GaN films by molecular beam epitaxy and remote plasma MOCVD

    Energy Technology Data Exchange (ETDEWEB)

    Losurdo, M.; Capezzuto, P.; Bruno, G. [Plasmachemistry Research Center, CNR, Bari (Italy); Namkoong, G.; Doolittle, W.A.; Brown, A.S. [Georgia Inst. of Tech., Atlanta (United States). School of Electrical and Computer Engineering, Microelectronic Research Center

    2002-03-16

    GaN heteroepitaxial growth on sapphire (0001) substrates was carried out by both radio-frequency (rf) remote plasma metalorganic chemical vapor deposition (RP-MOCVD) and molecular beam epitaxy (MBE). A multistep growth process including substrate plasma cleaning and nitridation, buffer growth, its subsequent annealing and epilayer growth was used. In order to achieve a better understanding of the GaN growth, in-situ real time investigation of the surface chemistry is performed for all the steps using the conventional reflection high-energy electron spectroscopy (RHEED) during the MBE process, while laser reflectance interferometry (LRI) and spectroscopic ellipsometry (SE), which do not require UHV conditions, are used for the monitoring of the RP-MOCVD process. The chemistry of the rf N{sub 2} plasma sapphire nitridation and its effect on the epilayer growth and quality are discussed in both MBE and RP-MOCVD. (orig.)

  11. Plasma enhanced RF power deposition on ICRF antennas in Tore Supra

    International Nuclear Information System (INIS)

    Goulding, R.H.; Harris, J.H.; Carter, M.D.; Hoffman, D.J.; Hogan, J.T.; Ryan, P.M.; Beaumont, B.; Bremond, S.; Hutter, T.

    1997-01-01

    The dual-strap Tore Supra ICRF antennas have been very successful in coupling high power fluxes > 16 MW/m2 to the plasma. In many cases it has been found that the power is limited not by the voltages and currents that can be sustained on antenna components, but rather by localized increases in antenna surface temperatures which are correlated with increased impurity levels. Hot spots have been observed using an IR imaging system with peak temperatures as high as 1,100 C after 2 s, and as little as 1.5 MW power coupled from a single launcher. The maximum temperature observed is highly dependent on antenna phasing, and is lowest with dipole (π) phasing of the relative antenna currents. Both toroidal and poloidal asymmetries in hot spot distribution have been observed, and interestingly, the toroidal asymmetry has been found to vary when the phase is changed from +π/2 to -π/2. Significant differences in the temperature profiles have been seen on the two types of Faraday shield in use, which appears to be related to the fact that one type has a recessed center septum between straps while the other does not. In some cases, the peak temperature has been observed to increase as the antenna/plasma gap is increased, while the peak remains in the same location. This behavior suggests that voltages generated by currents flowing in the Faraday shield structure itself may play a role in generating potentials responsible for the hot spots, in addition to rf fields in the plasma. In this paper data on antenna surface heating and loading data as a function of plasma density, antenna/plasma gap, and phasing will be presented. Calculations from the RANT3D electromagnetic code together with bench measurements of electric fields near the antenna surface will also be shown

  12. Influences of the cold atmospheric plasma jet treatment on the properties of the demineralized dentin surfaces

    Science.gov (United States)

    Xiaoming, ZHU; Heng, GUO; Jianfeng, ZHOU; Xiaofei, ZHANG; Jian, CHEN; Jing, LI; Heping, LI; Jianguo, TAN

    2018-04-01

    Improvement of the bonding strength and durability between the dentin surface and the composite resin is a challenging job in dentistry. In this paper, a radio-frequency atmospheric-pressure glow discharge (RF-APGD) plasma jet is employed for the treatment of the acid-etched dentin surfaces used for the composite restoration. The properties of the plasma treated dentin surfaces and the resin-dentin interfaces are analyzed using the x-ray photoemission spectroscopy, contact angle goniometer, scanning electron microscope and microtensile tester. The experimental results show that, due to the abundant chemically reactive species existing in the RF-APGD plasma jet under a stable and low energy input operating mode, the contact angle of the plasma-treated dentin surfaces decreases to a stable level with the increase of the atomic percentage of oxygen in the specimens; the formation of the long resin tags in the scattered clusters and the hybrid layers at the resin-dentin interfaces significantly improve the bonding strength and durability. These results indicate that the RF-APGD plasma jet is an effective tool for modifying the chemical properties of the dentin surfaces, and for improving the immediate bonding strength and the durability of the resin-dentin bonding in dentistry.

  13. Optical constants of silicon-like (Si:Ox:Cy:Hz) thin films deposited on quartz using hexamethyldisiloxane in a remote RF hollow cathode discharge plasma

    International Nuclear Information System (INIS)

    Saloum, S.; Naddaf, M.

    2008-01-01

    Deposition of amorphous silicon-like (Si:O x :C y :H z ) thin films in a remote RF hollow cathode discharge plasma using Hexamethyldisoloxane as monomer and Ar as feed gas; has been investigated for films optical constants and plasma diagnostic as a function of RF power (100-300 W) and precursor flow rate (1-10 sccm). Plasma diagnostic has been performed using optical emission spectroscopy (OES). The optical constants (refractive index, extinction coefficient and dielectric constant) have been obtained by reflection/transmission measurements in the range 300-700 nm. It is found that the refractive index increases from 1.92 to 1.97 with increasing power from 100 to 300 W, and from 1.70 to 1.92 with increasing precursor flow rate from 1 to 10 sccm. The optical energy-band gap E g and the optical-absorption tail ΔE have been estimated from optical absorption spectra, it is found that E g decreases from 3.28 eV to 3.14 eV with power increase from 100 to 300 W, and from 3.54 eV to 3.28 eV with precursor flow rate increase from 1 to 10 sccm. ΔE is found to increase with applied RF power and precursor flow rate increase. The dependence of optical constants on deposition parameters has been correlated to plasma OES. (author)

  14. Morphology, optical and electrical properties of Cu-Ni nanoparticles in a-C:H prepared by co-deposition of RF-sputtering and RF-PECVD

    Energy Technology Data Exchange (ETDEWEB)

    Ghodselahi, T., E-mail: ghodselahi@ipm.ir [School of Physics, Institute for Research in Fundamental Sciences (IPM), P.O. Box 19395-5531, Tehran (Iran, Islamic Republic of); Vesaghi, M.A. [School of Physics, Institute for Research in Fundamental Sciences (IPM), P.O. Box 19395-5531, Tehran (Iran, Islamic Republic of); Department of Physics, Sharif University of Technology, P.O. Box 11365-9161, Tehran (Iran, Islamic Republic of); Gelali, A.; Zahrabi, H.; Solaymani, S. [Young Researchers Club, Islamic Azad University, Kermanshah Branch, Kermanshah (Iran, Islamic Republic of)

    2011-11-01

    We report optical and electrical properties of Cu-Ni nanoparticles in hydrogenated amorphous carbon (Cu-Ni NPs - a-C:H) with different surface morphology. Ni NPs with layer thicknesses of 5, 10 and 15 nm over Cu NPs - a-C:H were prepared by co-deposition of RF-sputtering and RF-Plasma Enhanced Chemical Vapor Deposition (RF-PECVD) from acetylene gas and Cu and Ni targets. A nonmetal-metal transition was observed as the thickness of Ni over layer increases. The surface morphology of the sample was described by a two dimensional (2D) Gaussian self-affine fractal, except the sample with 10 nm thickness of Ni over layer, which is in the nonmetal-metal transition region. X-ray diffraction profile indicates that Cu NPs and Ni NPs with fcc crystalline structure are formed in these films. Localized Surface Plasmon Resonance (LSPR) peak of Cu NPs is observed around 600 nm in visible spectra, which is widen and shifted to lower wavelengths as the thickness of Ni over layer increases. The variation of LSPR peak width correlates with conductivity variation of these bilayers. We assign both effects to surface electron delocalization of Cu NPs.

  15. RF current generation near the ion cyclotron frequency

    International Nuclear Information System (INIS)

    Watkins, J.G.

    1982-01-01

    An experiment has been conducted to measure unipolar currents driven by directional radio frequency waves in a cylindrical plasma mirror machine near the ion cyclotron frequency. The directional waves were launched using a four phase helical coupler which allowed the selection of both azimuthal mode number (m = +1) and direction of wave propagation. Plasma diagnostics include electron density measurements (4 mm microwave interferometer), electron temperature measurements (floating double probe), wave amplitude and coupling measurements (magnetic probes). RF power measurements (RF voltage and current probes) and RF driven plasma current measurements (Rogowski loops and current transformers). End electrodes provided a necessary external return path and an alternate method for measuring the current. Theoretical work includes an analytic approximation to the nonlinear problem of a particle in a traveling wave and computer simulations that extend this result. Nonlinear particle drifts other than trapping were found both with and without the presence of particle collisions

  16. Plasma etching of (Ba,Sr)TiO3 thin films using inductively coupled Cl2/Ar and BCl3/Cl2/Ar plasma

    International Nuclear Information System (INIS)

    Kim, Gwan-Ha; Kim, Kyoung-Tae; Kim, Dong-Pyo; Kim, Chang-Il

    2005-01-01

    BST thin films were etched with inductively coupled plasmas. A chemically assisted physical etch of BST was experimentally confirmed by ICP under various gas mixtures. After a 20% addition of BCl 3 to the Cl 2 /Ar mixture, resulting in an increased the chemical effect. As increases of RF power and substrate power, and decrease of working pressure, the ion energy flux and chlorine atoms density increased. The maximum etch rate of the BST thin films was 90.1 nm/min, and at the RF power, substrate power, and working pressure were 700 W, 300 W, and 1.6 Pa, respectively. It was proposed that sputter etching is dominant etching mechanism while the contribution of chemical reaction is relatively low due to low volatility of etching products

  17. Synthesis of Ni2B nanoparticles by RF thermal plasma for fuel cell catalyst

    International Nuclear Information System (INIS)

    Cheng, Y; Tanaka, M; Watanabe, T; Choi, S Y; Shin, M S; Lee, K H

    2014-01-01

    The catalyst of Ni 2 B nanoparticles was successfully prepared using nickel and boron as precursors with the quenching gas in radio frequency thermal plasmas. The generating of Ni 2 B needs adequate reaction temperature and boron content in precursors. The quenching gas is beneficial for the synthesis of Ni 2 B in RF thermal plasma. The effect of quenching rate, powder feed rate and boron content in feeding powders on the synthesis of nickel boride nanoparticles was studied in this research. The high mass fraction of 28 % of Ni 2 B nanoparticles can be generated at the fixed initial composition of Ni:B = 2:3. Quenching gas is necessary in the synthesis of Ni 2 B nanoaprticles. In addition, the mass fraction of Ni 2 B increases with the increase of quenching gas flow rate and powder feed rate

  18. Radio frequency plasma excitation

    International Nuclear Information System (INIS)

    Burden, M.St.J.; Cross, K.B.

    1979-01-01

    An investigation into the use of rf sputtering for ion cleaning of insulating substrates before ion plating is reported. Initial experiments consisted of sputtering metals with rf power followed by the deposition of copper onto glass slides using rf plasma excitation and biasing supply. It was found that good quality films were obtained by rf ion plating onto plastics with excellent adhesion over a wide operating pressure range. A block schematic of the rf plasma excitation system is shown. (UK)

  19. Development of solid oxide fuel cells by applying DC and RF plasma deposition technologies

    Energy Technology Data Exchange (ETDEWEB)

    Schiller, G.; Henne, R.; Lang, M.; Mueller, M. [Deutsches Zentrum fuer Luft- und Raumfahrt (DLR), Institut fuer Technische Thermodynamik, Postfach 800370, 70503 Stuttgart (Germany)

    2004-04-01

    Based on advanced plasma deposition technology with both DC and RF plasmas DLR Stuttgart has developed a concept of a planar SOFC with consecutive deposition of all layers of a thin-film cell onto a porous metallic substrate support. This concept is an alternative approach to conventionally used sintering techniques for SOFC fabrication without needing any sintering steps or other thermal post-treatment. Furthermore, is has the potential to be developed into an automated continous production process. For both stationary and mobile applications, adequate stack designs and stack technologies have been developed. Future development work will focus on light-weight stacks to be applied as an Auxillary Power Unit (APU) for on-board electricity supply in passenger cars and airplanes. This paper describes the plasma deposition technologies used for cell fabrication and the DLR spray concept including the resulting stack designs. The current status of development and recent progress with respect to materials development and electrochemical characterization of single cells and short-stacks is presented. (Abstract Copyright [2004], Wiley Periodicals, Inc.)

  20. A versatile ray-tracing code for studying rf wave propagation in toroidal magnetized plasmas

    International Nuclear Information System (INIS)

    Peysson, Y; Decker, J; Morini, L

    2012-01-01

    A new ray-tracing code named C3PO has been developed to study the propagation of arbitrary electromagnetic radio-frequency (rf) waves in magnetized toroidal plasmas. Its structure is designed for maximum flexibility regarding the choice of coordinate system and dielectric model. The versatility of this code makes it particularly suitable for integrated modeling systems. Using a coordinate system that reflects the nested structure of magnetic flux surfaces in tokamaks, fast and accurate calculations inside the plasma separatrix can be performed using analytical derivatives of a spline-Fourier interpolation of the axisymmetric toroidal MHD equilibrium. Applications to reverse field pinch magnetic configuration are also included. The effects of 3D perturbations of the axisymmetric toroidal MHD equilibrium, due to the discreteness of the magnetic coil system or plasma fluctuations in an original quasi-optical approach, are also studied. Using a Runge–Kutta–Fehlberg method for solving the set of ordinary differential equations, the ray-tracing code is extensively benchmarked against analytical models and other codes for lower hybrid and electron cyclotron waves. (paper)

  1. Coincident ion acceleration and electron extraction for space propulsion using the self-bias formed on a set of RF biased grids bounding a plasma source

    International Nuclear Information System (INIS)

    Rafalskyi, D; Aanesland, A

    2014-01-01

    We propose an alternative method to accelerate ions in classical gridded ion thrusters and ion sources such that co-extracted electrons from the source may provide beam space charge neutralization. In this way there is no need for an additional electron neutralizer. The method consists of applying RF voltage to a two-grid acceleration system via a blocking capacitor. Due to the unequal effective area of the two grids in contact with the plasma, a dc self-bias is formed, rectifying the applied RF voltage. As a result, ions are continuously accelerated within the grid system while electrons are emitted in brief instants within the RF period when the RF space charge sheath collapses. This paper presents the first experimental results and a proof-of-principle. Experiments are carried out using the Neptune thruster prototype which is a gridded Inductively Coupled Plasma (ICP) source operated at 4 MHz, attached to a larger beam propagation chamber. The RF power supply is used both for the ICP discharge (plasma generation) and powering the acceleration grids via a capacitor for ion acceleration and electron extraction without any dc power supplies. The ion and electron energies, particle flux and densities are measured using retarding field energy analyzers (RFEA), Langmuir probes and a large beam target. The system operates in Argon and N 2 . The dc self-bias is found to be generated within the gridded extraction system in all the range of operating conditions. Broad quasi-neutral ion-electron beams are measured in the downstream chamber with energies up to 400 eV. The beams from the RF acceleration method are compared with classical dc acceleration with an additional external electron neutralizer. It is found that the two acceleration techniques provide similar performance, but the ion energy distribution function from RF acceleration is broader, while the floating potential of the beam is lower than for the dc accelerated beam. (paper)

  2. Combustion flame-plasma hybrid reactor systems, and chemical reactant sources

    Science.gov (United States)

    Kong, Peter C

    2013-11-26

    Combustion flame-plasma hybrid reactor systems, chemical reactant sources, and related methods are disclosed. In one embodiment, a combustion flame-plasma hybrid reactor system comprising a reaction chamber, a combustion torch positioned to direct a flame into the reaction chamber, and one or more reactant feed assemblies configured to electrically energize at least one electrically conductive solid reactant structure to form a plasma and feed each electrically conductive solid reactant structure into the plasma to form at least one product is disclosed. In an additional embodiment, a chemical reactant source for a combustion flame-plasma hybrid reactor comprising an elongated electrically conductive reactant structure consisting essentially of at least one chemical reactant is disclosed. In further embodiments, methods of forming a chemical reactant source and methods of chemically converting at least one reactant into at least one product are disclosed.

  3. Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa

    Science.gov (United States)

    Kousal, Jaroslav; Tichý, Milan; Šebek, Ondřej; Čechvala, Juraj; Biederman, Hynek

    2011-08-01

    The majority of plasma polymerization sources operate at pressures higher than 1 Pa. At these pressures most common deposition methods do not show significant directionality. One way of enhancing the directional effects is to decrease the working pressure to increase the mean free path of the reactive molecules. The plasma source used in this work was designed to study the plasma polymerization process at pressures below 0.1 Pa. The source consists of the classical radio frequency (RF) (13.56 MHz, capacitive coupled) tubular reactor enhanced by an external magnetic circuit. The working gas is introduced into the discharge by a capillary. This forms a relatively localized zone of higher pressure where the monomer is activated. Due to the magnetic field, the plasma is constricted near the axis of the reactor with nearly collisionless gas flow. The plasma parameters were obtained using a double Langmuir probe. Plasma density in the range ni = 1013-1016 m-3 was obtained in various parts of the discharge under typical conditions. The presence of the magnetic field led to the presence of relatively strong electric fields (103 V m-1) and relatively high electron energies up to several tens of eV in the plasma.

  4. Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa

    Energy Technology Data Exchange (ETDEWEB)

    Kousal, Jaroslav; Tichy, Milan; Sebek, Ondrej; Cechvala, Juraj; Biederman, Hynek, E-mail: jaroslav.kousal@mff.cuni.cz [Charles University in Prague, Faculty of Mathematics and Physics, V Holesovickach 2, 180 00, Prague 8 (Czech Republic)

    2011-08-15

    The majority of plasma polymerization sources operate at pressures higher than 1 Pa. At these pressures most common deposition methods do not show significant directionality. One way of enhancing the directional effects is to decrease the working pressure to increase the mean free path of the reactive molecules. The plasma source used in this work was designed to study the plasma polymerization process at pressures below 0.1 Pa. The source consists of the classical radio frequency (RF) (13.56 MHz, capacitive coupled) tubular reactor enhanced by an external magnetic circuit. The working gas is introduced into the discharge by a capillary. This forms a relatively localized zone of higher pressure where the monomer is activated. Due to the magnetic field, the plasma is constricted near the axis of the reactor with nearly collisionless gas flow. The plasma parameters were obtained using a double Langmuir probe. Plasma density in the range n{sub i} = 10{sup 13}-10{sup 16} m{sup -3} was obtained in various parts of the discharge under typical conditions. The presence of the magnetic field led to the presence of relatively strong electric fields (10{sup 3} V m{sup -1}) and relatively high electron energies up to several tens of eV in the plasma.

  5. Effect of single aerosol droplets on plasma impedance in the inductively coupled plasma

    Energy Technology Data Exchange (ETDEWEB)

    Chan, George C.-Y., E-mail: gcchan@indiana.edu; Zhu, Zhenli; Hieftje, Gary M.

    2012-10-15

    The impedance of an inductively coupled plasma was indirectly monitored by two different means-through a RF-probe coil placed inside the torch housing and from tapping the phase-detector signal of the impedance-matching network. During single-droplet introduction, temporal spikes in both the RF-probe coil and the phase-detector signals were readily observed, indicating a momentary change in plasma impedance. The changes in plasma impedance were found to be due solely to plasma perturbation by droplet introduction, and not to an artifact caused by imperfect automatic impedance matching. The temporal changes in plasma impedance were found to be directly proportional to the temporally integrated atomic emission of hydrogen, which is assumed in turn to be directly proportional to the volume of the introduced droplet. A small satellite droplet, with an estimated diameter of 27 {mu}m (i.e., {approx} 10 pL in volume), caused a readily measurable change in plasma impedance. By assuming that the change in RF-probe voltage is directly proportional to the variation in RF power delivered by the load coil, the instantaneous power change coupled to the plasma during single-droplet introduction was estimated. Typical increases in peak RF power and total energy coupled to the plasma, for a single 50-{mu}m droplet introduction, were thereby estimated to be around 8 to 11 W and 0.03 to 0.04 J, respectively. This impedance change was also exploited as a trigger to signal the droplet-introduction event into the plasma. This trigger signal was obtained through a combination of the RF-probe and the phase-detector signals and offered typical jitter from 1 to 2 ms. With the proper choice of a trigger threshold, no trigger misfire resulted and the achievable efficiencies of the trigger signal were 99.95, 97.18 and 74.33% for plasma forward power levels of 900, 1200, and 1500 W, respectively. The baseline noise on the RF-probe coil and the phase-detector signals, which increase with plasma

  6. Investigation of the flatband voltage (V(FB)) shift of Al2O3 on N2 plasma treated Si substrate.

    Science.gov (United States)

    Kim, Hyungchul; Lee, Jaesang; Jeon, Heeyoung; Park, Jingyu; Jeon, Hyeongtag

    2013-09-01

    The relationships between the physical and electrical characteristics of films treated with N2 plasma followed by forming gas annealing (FGA) were investigated. The Si substrates were treated with various radio frequency (RF) power levels under a N2 ambient. Al2O3 films were then deposited on Si substrates via remote plasma atomic-layer deposition. The plasma characteristics, such as the radical and ion density, were investigated using optical emission spectroscopy. Through X-ray photoelectron spectroscopy, the chemical-bonding configurations of the samples treated with N2 plasma and FGA were examined. The quantity of Si-N bonds increased as the RF power was increased, and Si--O--N bonds were generated after FGA. The flatband voltage (VFB) was shifted in the negative direction with increasing RF power, but the VFB values of the samples after FGA shifted in the positive direction due to the formation of Si--O--N bonds. N2 plasma treatment with various RF power levels slightly increased the leakage current due to the generation of defect sites.

  7. Self-consistent calculation of the effects of RF injection in the HHFW heating regimes on the evolution of fast ions in toroidal plasmas

    Directory of Open Access Journals (Sweden)

    Bertelli Nicola

    2017-01-01

    Full Text Available A critical question for the use of ion cyclotron range of frequency (ICRF heating in the ITER device and beyond is interaction of fast waves with energetic ion populations from neutral beam injection (NBI, fusion reactions, and minority ions accelerated by the RF waves themselves. Several experiments have demonstrated that the interaction between fast waves and fast ions can indeed be strong enough to significantly modify the NB ion population. To model the RF/fast ion interaction and the resulting fast ion distribution, a recent extension of the full wave solver TORIC v.5 that includes non-Maxwellian effects has been combined with the Monte Carlo NUBEAM code through an RF “kick” operator. In this work, we present an initial verification of the NUBEAM RF “kick” operator for high harmonic fast wave (HHFW heating regime in NSTX plasma.

  8. Etching of UO2 in NF3 RF Plasma Glow Discharge

    International Nuclear Information System (INIS)

    John M. Veilleux

    1999-01-01

    A series of room temperature, low pressure (10.8 to 40 Pa), low power (25 to 210 W) RF plasma glow discharge experiments with UO 2 were conducted to demonstrate that plasma treatment is a viable method for decontaminating UO 2 from stainless steel substrates. Experiments were conducted using NF 3 gas to decontaminate depleted uranium dioxide from stainless-steel substrates. Depleted UO 2 samples each containing 129.4 Bq were prepared from 100 microliter solutions of uranyl nitrate hexahydrate solution. The amorphous UO 2 in the samples had a relatively low density of 4.8 gm/cm 3 . Counting of the depleted UO 2 on the substrate following plasma immersion was performed using liquid scintillation counting with alpha/beta discrimination due to the presence of confounding beta emitting daughter products, 234 Th and 234 Pa. The alpha emission peak from each sample was integrated using a gaussian and first order polynomial fit to improve quantification. The uncertainties in the experimental measurement of the etched material were estimated at about ± 2%. Results demonstrated that UO 2 can be completely removed from stainless-steel substrates after several minutes processing at under 200 W. At 180 W and 32.7 Pa gas pressure, over 99% of all UO 2 in the samples was removed in just 17 minutes. The initial etch rate in the experiments ranged from 0.2 to 7.4 microm/min. Etching increased with the plasma absorbed power and feed gas pressure in the range of 10.8 to 40 Pa. A different pressure effect on UO 2 etching was also noted below 50 W in which etching increased up to a maximum pressure, approximately23 Pa, then decreased with further increases in pressure

  9. Fundamental aspects of plasma chemical physics Thermodynamics

    CERN Document Server

    Capitelli, Mario; D'Angola, Antonio

    2012-01-01

    Fundamental Aspects of Plasma Chemical Physics - Thermodynamics develops basic and advanced concepts of plasma thermodynamics from both classical and statistical points of view. After a refreshment of classical thermodynamics applied to the dissociation and ionization regimes, the book invites the reader to discover the role of electronic excitation in affecting the properties of plasmas, a topic often overlooked by the thermal plasma community. Particular attention is devoted to the problem of the divergence of the partition function of atomic species and the state-to-state approach for calculating the partition function of diatomic and polyatomic molecules. The limit of ideal gas approximation is also discussed, by introducing Debye-Huckel and virial corrections. Throughout the book, worked examples are given in order to clarify concepts and mathematical approaches. This book is a first of a series of three books to be published by the authors on fundamental aspects of plasma chemical physics.  The next bo...

  10. A 1D ion species model for an RF driven negative ion source

    Science.gov (United States)

    Turner, I.; Holmes, A. J. T.

    2017-08-01

    A one-dimensional model for an RF driven negative ion source has been developed based on an inductive discharge. The RF source differs from traditional filament and arc ion sources because there are no primary electrons present, and is simply composed of an antenna region (driver) and a main plasma discharge region. However the model does still make use of the classical plasma transport equations for particle energy and flow, which have previously worked well for modelling DC driven sources. The model has been developed primarily to model the Small Negative Ion Facility (SNIF) ion source at CCFE, but may be easily adapted to model other RF sources. Currently the model considers the hydrogen ion species, and provides a detailed description of the plasma parameters along the source axis, i.e. plasma temperature, density and potential, as well as current densities and species fluxes. The inputs to the model are currently the RF power, the magnetic filter field and the source gas pressure. Results from the model are presented and where possible compared to existing experimental data from SNIF, with varying RF power, source pressure.

  11. Wave propagation in a quasi-chemical equilibrium plasma

    Science.gov (United States)

    Fang, T.-M.; Baum, H. R.

    1975-01-01

    Wave propagation in a quasi-chemical equilibrium plasma is studied. The plasma is infinite and without external fields. The chemical reactions are assumed to result from the ionization and recombination processes. When the gas is near equilibrium, the dominant role describing the evolution of a reacting plasma is played by the global conservation equations. These equations are first derived and then used to study the small amplitude wave motion for a near-equilibrium situation. Nontrivial damping effects have been obtained by including the conduction current terms.

  12. Decontamination of Chemical/Biological Warfare (CBW) Agents Using an Atmospheric Pressure Plasma Jet (APPJ)

    Science.gov (United States)

    Herrmann, Hans W.

    1998-11-01

    The atmospheric pressure plasma jet (APPJ) is a non-thermal, high pressure, uniform glow discharge that produces a high velocity effluent stream of highly reactive chemical species. The discharge operates on a feedstock gas (e.g. He/O_2/H_2O) which flows between an outer, grounded, cylindrical electrode and an inner, coaxial electrode powered at 13.56 MHz RF. While passing through the plasma, the feedgas becomes excited, dissociated or ionized by electron impact. Once the gas exits the discharge volume, ions and electrons are rapidly lost by recombination, but the fast-flowing effluent still contains metastables (e.g. O2*, He*) and radicals (e.g. O, OH). These reactive species have been shown to be effective neutralizers of surrogates for anthrax spores, mustard blister agent and VX nerve gas. Unlike conventional, wet decontamination methods, the plasma effluent does not cause corrosion of most surfaces and does not damage wiring, electronics, nor most plastics. This makes it highly suitable for decontamination of high value sensitive equipment such as is found in vehicle interiors (i.e. tanks, planes...) for which there is currently no good decontamination technique. Furthermore, the reactive species rapidly degrade into harmless products leaving no lingering residue or harmful byproducts. Physics of the APPJ will be discussed and results of surface decontamination experiments using simulant and actual CBW agents will be presented.

  13. JET ({sup 3}He)-D scenarios relying on RF heating: survey of selected recent experiments

    Energy Technology Data Exchange (ETDEWEB)

    Van Eester, D; Lerche, E; Andrew, Y; Biewer, T M; Casati, A; Crombe, K; De la Luna, E; Ericsson, G; Felton, R; Giacomelli, L; Giroud, C; Hawkes, N; Hellesen, C; Hjalmarsson, A; Joffrin, E; Kaellne, J; Kiptily, V; Lomas, P; Mantica, P; Marinoni, A [JET-EFDA Culham Science Centre, Abingdon, OX14 3DB (United Kingdom)] (and others)

    2009-04-15

    Recent JET experiments have been devoted to the study of ({sup 3}He)-D plasmas involving radio frequency (RF) heating. This paper starts by discussing the RF heating efficiency theoretically expected in such plasmas, covering both relevant aspects of wave and of particle dynamics. Then it gives a concise summary of the main conclusions drawn from recent experiments that were either focusing on studying RF heating physics aspects or that were adopting RF heating as a tool to study plasma behavior. Depending on the minority concentration chosen, different physical phenomena are observed. At very low concentration (X[{sup 3}He] < 1%), energetic tails are formed which trigger MHD activity and result in loss of fast particles. Alfven cascades were observed and gamma ray tomography indirectly shows the impact of sawtooth crashes on the fast particle orbits. Low concentration (X[{sup 3}He] < 10%) favors minority heating while for X[{sup 3}He] >> 10% electron mode conversion damping becomes dominant. Evidence for the Fuchs et al standing wave effect (Fuchs et al 1995 Phys. Plasmas 2 1637-47) on the absorption is presented. RF induced deuterium tails were observed in mode conversion experiments with large X[{sup 3}He] ({approx}18%). As tentative modeling shows, the formation of these tails can be explained as a consequence of wave power absorption by neutral beam particles that efficiently interact with the waves well away from the cold D cyclotron resonance position as a result of their substantial Doppler shift. As both ion and electron RF power deposition profiles in ({sup 3}He)-D plasmas are fairly narrow-giving rise to localized heat sources-the RF heating method is an ideal tool for performing transport studies. Various of the experiments discussed here were done in plasmas with internal transport barriers (ITBs). ITBs are identified as regions with locally reduced diffusivity, where poloidal spinning up of the plasma is observed. The present know-how on the role of

  14. The TFTR RF Limiter upgrade design and installation

    International Nuclear Information System (INIS)

    Barnes, G.W.; Fan, H.M.; Ulrickson, M.

    1991-01-01

    The RF Limiters originally installed at Bays K-L and N-O[1] were upgraded to a new configuration and six new limiters of similar design were added. The RF Limiter upgrade protects the (2) existing RF Launchers and with a minor addition will protect the (2) RF Launchers to be installed in FY92 and will permit 50 Megawatts of auxiliary input power for two seconds during plasma operation. Each of the new RF Limiters are comprised of 18 tiles for a total of 108. The design provides for revised and strengthened supporting mounts because of additional forces induced in the tiles. Tile material is a 2D carbon-carbon composite identical to the original tile material. The channel shaped tile is geometrically the same as the original design. Subassembly of the panels took place outside the vessel in order to minimize exposure levels to the workers. Tooling was designed to replicate the vessel hardpoints and ease the subassembly tasks. Installation of the entire system occurred during the FY 91 opening. Integrated into the design are provisions to eliminate plasma damage to the insulators at the mounts. Detail design philosophy and an overview of the project are addressed by this paper. 2 refs., 2 figs

  15. Sequential modelling of ICRF wave near RF fields and asymptotic RF sheaths description for AUG ICRF antennas

    Directory of Open Access Journals (Sweden)

    Jacquot Jonathan

    2017-01-01

    Full Text Available A sequence of simulations is performed with RAPLICASOL and SSWICH to compare two AUG ICRF antennas. RAPLICASOL outputs have been used as input to SSWICH-SW for the AUG ICRF antennas. Using parallel electric field maps and the scattering matrix produced by RAPLICASOL, SSWICH-SW, reduced to its asymptotic part, is able to produce a 2D radial/poloidal map of the DC plasma potential accounting for the antenna input settings (total power, power balance, phasing. Two models of antennas are compared: 2-strap antenna vs 3-strap antenna. The 2D DC potential structures are correlated to structures of the parallel electric field map for different phasing and power balance. The overall DC plasma potential on the 3-strap antenna is lower due to better global RF currents compensation. Spatial proximity between regions of high RF electric field and regions where high DC plasma potentials are observed is an important factor for sheath rectification.

  16. Excitation of surface waves and electrostatic fields by a RF (radiofrequency systems) wave in a plasma sheath with current

    International Nuclear Information System (INIS)

    Gutierrez Tapia, C.

    1990-01-01

    It is shown in a one-dimensional model that when a current in a plasma sheath is present, the excitation of surface waves and electrostatic fields by a RF wave is possible in the sheath. This phenomena depends strongly on the joint action of Miller's and driven forces. It is also shown that the action of these forces are carried out at different characteristic times when the wave front travels through the plasma sheath. The influence of the current, in the steady limit, is taken into account by a small functional variation of the density perturbations and generated electrostatic field. (Author)

  17. Simulation of RF power and multi-cusp magnetic field requirement for H{sup −} ion sources

    Energy Technology Data Exchange (ETDEWEB)

    Pathak, Manish [Ion Source Lab., Proton Linac & Superconducting Cavities Division, Raja Ramanna Centre for Advanced Technology, Indore, Madhya Pradesh 452013 (India); Senecha, V.K., E-mail: kumarvsen@gmail.com [Ion Source Lab., Proton Linac & Superconducting Cavities Division, Raja Ramanna Centre for Advanced Technology, Indore, Madhya Pradesh 452013 (India); Homi Bhabha National Institute, Raja Ramanna Centre for Advanced Technology, Indore, Madhya Pradesh 452013 (India); Kumar, Rajnish; Ghodke, Dharmraj V. [Ion Source Lab., Proton Linac & Superconducting Cavities Division, Raja Ramanna Centre for Advanced Technology, Indore, Madhya Pradesh 452013 (India)

    2016-12-01

    A computer simulation study for multi-cusp RF based H{sup −} ion source has been carried out using energy and particle balance equation for inductively coupled uniformly dense plasma considering sheath formation near the boundary wall of the plasma chamber for RF ion source used as high current injector for 1 Gev H{sup −} Linac project for SNS applications. The average reaction rates for different reactions responsible for H{sup −} ion production and destruction have been considered in the simulation model. The RF power requirement for the caesium free H{sup -} ion source for a maximum possible H{sup −} ion beam current has been derived by evaluating the required current and RF voltage fed to the coil antenna using transformer model for Inductively Coupled Plasma (ICP). Different parameters of RF based H{sup −} ion source like excited hydrogen molecular density, H{sup −} ion density, RF voltage and current of RF antenna have been calculated through simulations in the presence and absence of multicusp magnetic field to distinctly observe the effect of multicusp field. The RF power evaluated for different H{sup −} ion current values have been compared with the experimental reported results showing reasonably good agreement considering the fact that some RF power will be reflected from the plasma medium. The results obtained have helped in understanding the optimum field strength and field free regions suitable for volume emission based H{sup −} ion sources. The compact RF ion source exhibits nearly 6 times better efficiency compare to large diameter ion source.

  18. Few atom chemistry of the trans actinide element rutherfordium (Rf)

    International Nuclear Information System (INIS)

    Nagame, Y.

    2002-01-01

    Studies of chemical properties of the trans actinide elements - starting with element 104 (Rf) - offer the unique opportunity to obtain information about trends in the Periodic Table at the limits of nuclear stability and to assess the magnitude of the influence of relativistic effects on chemical properties. To explore experimentally the influence of relativistic effects of electron shell structure, we study the chemical properties of the trans actinide elements. So far, we have developed some experimental apparatuses for the study of chemical properties of the trans actinide elements: a beam-line safety system for the usage of the gas-jet coupled radioactive 248 Cm target chamber for the production of trans actinides, a rotating wheel catcher apparatus for the measurement of α particles and spontaneous fission decay of trans actinides and an automated rapid chemical separation apparatus based on high performance liquid chromatography. The trans actinide nuclide, the element 104, 261 Rf (t 1/2 = 78 s) has been successfully produced via the reactions of 248 Cm( 18 O,5n) at the JAERI (Japan Atomic Energy Research Institute) tandem accelerator. The evaluated production cross section was about 10 nb, indicating that the production rate was approximately 2 atoms per min. Because of the short half-life and the low production rate of Rf, each atom produced decays before a new atom is synthesized. It means that any chemistry to be performed must be done on an 'atom-at-a-time' basis. Therefore rapid, very efficient and selective chemical procedures are indispensable to isolate the desired trans actinide 261 Rf. To perform fast and repetitive ion-exchange separation of Rf, we have developed the apparatus AIDA (Automated Ion exchange separation system coupled with the Detection apparatus for Alpha spectroscopy). Recently, ion-exchange behavior of Rf in acidic solutions has been studied with AIDA, and the results indicate that anion-exchange behavior of Rf is quite similar

  19. RF plasma based selective modification of hydrophilic regions on super hydrophobic surface

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Jaehyun; Hwang, Sangyeon; Cho, Dae-Hyun [Department of Mechanical Engineering, Sungkyunkwan University, Suwon 16419 (Korea, Republic of); Hong, Jungwoo [Department of Mechanical Engineering, Graduate of Medical Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 34141 (Korea, Republic of); Shin, Jennifer H., E-mail: j_shin@kaist.ac.kr [Department of Mechanical Engineering, Graduate of Medical Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 34141 (Korea, Republic of); Byun, Doyoung, E-mail: dybyun@skku.edu [Department of Mechanical Engineering, Sungkyunkwan University, Suwon 16419 (Korea, Republic of)

    2017-02-01

    Highlights: • Simple and amenable reforming method for a substrate with disparate patterns of hydrophilic dots on super-hydrophobic surfaces is proposed. • Wettability characteristics and modification mechanism for the surfaces are conducted and revealed through SEM, AFM, WSI, and SIMS. • Several representative materials for various applications are successfully deposited. - Abstract: Selective modification and regional alterations of the surface property have gained a great deal of attention to many engineers. In this paper, we present a simple, a cost-effective, and amendable reforming method for disparate patterns of hydrophilic regions on super-hydrophobic surfaces. Uniform super-hydrophobic layer (Contact angle; CA > 150°, root mean square (RMS) roughness ∼0.28 nm) can be formed using the atmospheric radio frequency (RF) plasma on top of the selective hydrophilic (CA ∼ 70°, RMS roughness ∼0.34 nm) patterns imprinted by electrohydrodynamic (EHD) jet printing technology with polar alcohols (butyl carbitol or ethanol). The wettability of the modified surface was investigated qualitatively utilizing scanning electron microscopy (SEM), atomic force microscopy (AFM), and wavelength scanning interferometer (WSI). Secondary ion mass spectroscopy (SIMS) analysis showed that the alcohol addiction reaction changed the types of radicals on the super-hydrophobic surface. The wettability was found to depend sensitively on chemical radicals on the surface, not on surface morphology (particle size and surface roughness). Furthermore, three different kinds of representative hydrophilic samples (polystyrene nano-particle aqueous solution, Salmonella bacteria medium, and poly(3,4-ethylenediocythiophene) ink) were tested for uniform deposition onto the desired hydrophilic regions. This simple strategy would have broad applications in various research fields that require selective deposition of target materials.

  20. RF plasma based selective modification of hydrophilic regions on super hydrophobic surface

    International Nuclear Information System (INIS)

    Lee, Jaehyun; Hwang, Sangyeon; Cho, Dae-Hyun; Hong, Jungwoo; Shin, Jennifer H.; Byun, Doyoung

    2017-01-01

    Highlights: • Simple and amenable reforming method for a substrate with disparate patterns of hydrophilic dots on super-hydrophobic surfaces is proposed. • Wettability characteristics and modification mechanism for the surfaces are conducted and revealed through SEM, AFM, WSI, and SIMS. • Several representative materials for various applications are successfully deposited. - Abstract: Selective modification and regional alterations of the surface property have gained a great deal of attention to many engineers. In this paper, we present a simple, a cost-effective, and amendable reforming method for disparate patterns of hydrophilic regions on super-hydrophobic surfaces. Uniform super-hydrophobic layer (Contact angle; CA > 150°, root mean square (RMS) roughness ∼0.28 nm) can be formed using the atmospheric radio frequency (RF) plasma on top of the selective hydrophilic (CA ∼ 70°, RMS roughness ∼0.34 nm) patterns imprinted by electrohydrodynamic (EHD) jet printing technology with polar alcohols (butyl carbitol or ethanol). The wettability of the modified surface was investigated qualitatively utilizing scanning electron microscopy (SEM), atomic force microscopy (AFM), and wavelength scanning interferometer (WSI). Secondary ion mass spectroscopy (SIMS) analysis showed that the alcohol addiction reaction changed the types of radicals on the super-hydrophobic surface. The wettability was found to depend sensitively on chemical radicals on the surface, not on surface morphology (particle size and surface roughness). Furthermore, three different kinds of representative hydrophilic samples (polystyrene nano-particle aqueous solution, Salmonella bacteria medium, and poly(3,4-ethylenediocythiophene) ink) were tested for uniform deposition onto the desired hydrophilic regions. This simple strategy would have broad applications in various research fields that require selective deposition of target materials.

  1. Strangeness Production in a Chemically Equilibrating Quark-Gluon Plasma

    Institute of Scientific and Technical Information of China (English)

    HE Ze-Jun; LONG Jia-Li; MA Yu-Gang; MA Guo-Liang

    2004-01-01

    @@ We study the strangeness of a chemically equilibrating quark-gluon plasma at finite baryon density based on the and will accelerate with the change of the initial system from a chemically non-equilibrated to an equilibrated system. We also find that the calculated strangeness is very different from the one in the thermodynamic equilibrium system. This study may be helpful to understand the formation of quark-gluon plasma via a chemically non-equilibrated evolution framework.

  2. Mechanism for heating of nitrogen plasmas in an electrodeless rf capacitive discharge at medium pressures

    International Nuclear Information System (INIS)

    Berdichevskii, M.G.; Marusin, V.V.

    1979-01-01

    The possible contributions of several processes to the experimentally observed heating of nitrogen plasmas in an electarodeless rf capacitive discharge at pressures of p=2.7-67 kPa are discussed. These processes are electron-rotational, vibrational--translational (V--T), and nonresonance vibrational--vibrational (V--V) energy exchange and effects due to O 2 , H 2 O, and NO impurities in the gas. It is shown that as the pressure is decreased the heating mechanism changes from quasiequilibrium to nonequilibrium V--T heating caused by overpopulation of high vibrational levels in the ground state of the nitrogen molecule

  3. Modification of surface properties of LLDPE by water plasma discharge

    International Nuclear Information System (INIS)

    Chantara Thevy Ratnam; Hill, D.J.T.; Firas Rasoul; Whittaker, A.K.; Imelda Keen

    2007-01-01

    Linear low density polyethylene (LLDPE) surface was modified by water plasma treatment. The LLDPE surface was treated at 10 and 20 W discharge power at various exposure times. A laboratory scale Megatherm radio frequency (RF) plasma apparatus that operates at 27 MHz was used to generate the water plasmas. The changes in chemical structure of the LLDPE polymeric chain upon plasma treatment were characterized by FTIR and XPS techniques. The selectivity of trifluoroacetic anhydride (TFAA) toward hydroxyl groups is used to quantify the hydroxyl groups formed on the polymer surface upon plasma treatment. After exposition to the plasma discharge a decline in water contact angle were observed. FTIR and XPS measurements indicate an oxidation of degraded polymeric chains and creation of hydroxyl, carbonyl, ether, ester and carboxyl groups. Chemical derivatization with TFAA of water plasma treated polymer surfaces has shown that under the conditions employed, a very small (less than 5%) of the oxygen introduced by the water plasma treatment was present as hydroxyl group. (Author)

  4. Plasma Immersion Ion Implantation in Radio Frequency Plasma

    International Nuclear Information System (INIS)

    Bora, B.; Bhuyan, H.; Wyndham, E.

    2013-01-01

    Plasma immersion ion implantation (PIII) has attracted wide interests since it emulates conventional ion-beam ion implantation (IBII) in niche applications. For instance, the technique has very high throughput, the implantation time is independent of the sample size, and samples with an irregular shape can be implanted without complex beam scanning or sample manipulation. For uniform ion implantation and deposition on to different substrates, like silicon, stainless steel etc., a capacitive coupled Radio frequency (RF), 13.6 MHz, plasma is used. During the PIII process, the physical parameters which are expected to play crucial rule in the deposition process like RF power, Negative pulse voltage and pulse duration, gas type and gas mixture, gas flow rates and the implantation dose are studied. The ion dose is calculated by dynamic sheath model and the plasma parameters are calculated from the V-I characteristic and power balance equation by homogeneous model of rf plasma discharge considering Ohmic as well as Stochastic heating. The correlations between the yield of the implantation process and the physical parameters as well as plasma parameters are discussed. (author)

  5. Plasma-polymerized hexamethyldisilazane treated by nitrogen plasma immersion ion implantation technique

    Energy Technology Data Exchange (ETDEWEB)

    Honda, R Y; Mota, R P; Batocki, R G S; Santos, D C R; Nicoleti, T; Kostov, K G; Kayama, M E; Algatti, M A [Laboratorio de Plasma, Faculdade de Engenharia, UNESP, Av. Dr Ariberto Pereira da Cunha-333, 12516-410, Guaratingueta, SP (Brazil); Cruz, N C [Laboratorio de Plasmas Tecnologicos, Unidade Diferenciada, UNESP, Av. Tres de Marco-511, 18085-180, Sorocaba, SP (Brazil); Ruggiero, L, E-mail: honda@feg.unesp.b [Faculdade de Ciencias, UNESP, Av. Luis E. Carrijo Coube 14-1, 17033-360, Bauru, SP (Brazil)

    2009-05-01

    This paper describes the effect of nitrogen Plasma Immersion Ion Implantation (PIII) on chemical structure, refraction index and surface hardness of plasma-polymerized hexamethyldisilazane (PPHMDSN) thin films. Firstly, polymeric films were deposited at 13.56 MHz radiofrequency (RF) Plasma Enhanced Chemical Vapour Deposition (PECVD) and then, were treated by nitrogen PIII from 15 to 60 min. Fourier Transformed Infrared (FTIR) spectroscopy was employed to analyse the molecular structure of the samples, and it revealed that vibrations modes at 3350 cm{sup -1}, 2960 cm{sup -1}, 1650 cm{sup -1}, 1250 cm{sup -1} and 1050 cm{sup -1} were altered by nitrogen PIII. Visible-ultraviolet (vis-UV) spectroscopy was used to evaluate film refractive index and the results showed a slight increase from 1.6 to 1.8 following the implantation time. Nanoindentation revealed a surface hardness rise from 0.5 to 2.3 GPa as PIII treatment time increased. These results indicate nitrogen PIII is very promising in improving optical and mechanical properties of PPHMDSN films.

  6. The RF voltage dependence of the electron sheath heating in low pressure capacitively coupled rf discharges

    International Nuclear Information System (INIS)

    Buddemeier, U.; Kortshagen, U.; Pukropski, I.

    1995-01-01

    In low pressure capacitively coupled RF discharges two competitive electron heating mechanisms have been discussed for some time now. At low pressures the stochastic sheath heating and for somewhat higher pressures the Joule heating in the bulk plasma have been proposed. When the pressure is increased at constant RF current density a transition from concave electron distribution functions (EDF) with a pronounced cold electron group to convex EDFs with a missing strong population of cold electrons is found. This transition was interpreted as the transition from dominant stochastic to dominant Joule heating. However, a different interpretation has been given by Kaganovich and Tsendin, who attributed the concave shaped EDFs to the spatially inhomogeneous RF field in combination with the nonlocality of the EDF

  7. High Power RF Transmitters for ICRF Applications on EAST

    International Nuclear Information System (INIS)

    Mao Yuzhou; Yuan Shuai; Zhao Yanping; Zhang Xinjun; Chen Gen; Cheng Yan; Wang Lei; Ju Songqing; Deng Xu; Qin Chengming; Yang Lei; Kumazawa, R.

    2013-01-01

    An Ion Cyclotron Range of Frequency (ICRF) system with a radio frequency (RF) power of 4 × 1.5 MW was developed for the Experimental Advanced Superconducting Tokamak (EAST). High RF power transmitters were designed as a part of the research and development (R and D) for an ICRF system with long pulse operation at megawatt levels in a frequency range of 25 MHz to 70 MHz. Studies presented in this paper cover the following parts of the high power transmitter: the three staged high power amplifier, which is composed of a 5 kW wideband solid state amplifier, a 100 kW tetrode drive stage amplifier and a 1.5 MW tetrode final stage amplifier, and the DC high voltage power supply (HVPS). Based on engineering design and static examinations, the RF transmitters were tested using a matched dummy load where an RF output power of 1.5 MW was achieved. The transmitters provide 6 MW RF power in primary phase and will reach a level up to 12 MW after a later upgrade. The transmitters performed successfully in stable operations in EAST and HT-7 devices. Up to 1.8 MW of RF power was injected into plasmas in EAST ICRF heating experiments during the 2010 autumn campaign and plasma performance was greatly improved.

  8. Annealing of hydrogen-induced defects in RF-plasma-treated Si wafers: ex situ and in situ transmission electron microscopy studies

    International Nuclear Information System (INIS)

    Ghica, C; Nistor, L C; Vizireanu, S; Dinescu, G

    2011-01-01

    The smart-cut(TM) process is based on inducing and processing structural defects below the free surface of semiconductor wafers. The necessary defects are currently induced by implantation of light elements such as hydrogen or helium. An alternative softer way to induce shallow subsurface defects is by RF-plasma hydrogenation. To facilitate the smart-cut process, the wafers containing the induced defects need to be subjected to an appropriate thermal treatment. In our experiments, (0 0 1) Si wafers are submitted to 200 and 50 W hydrogen RF-plasma and are subsequently annealed. The samples are studied by transmission electron microscopy (TEM), before and after annealing. The plasma-introduced defects are {1 1 1} and {1 0 0} planar-like defects and nanocavities, all of them involving hydrogen. Many nanocavities are aligned into strings almost parallel to the wafer surface. The annealing is performed either by furnace thermal treatment at 550 deg. C, or by in situ heating in the electron microscope at 450, 650 and 800 deg. C during the TEM observations. The TEM microstructural studies indicate a partial healing of the planar defects and a size increase of the nanometric cavities by a coalescence process of the small neighbouring nanocavities. By annealing, the lined up nanometric voids forming chains in the as-hydrogenated sample coalesced into well-defined cracks, mostly parallel to the wafer surface.

  9. Preliminary results of a broad beam RF ion source with electron plasma interaction. Vol. 2

    Energy Technology Data Exchange (ETDEWEB)

    Abdelaziz, M E; Zakhary, S G; Ghanem, A A; Abdel-Ghaffar, A M [Ion Sources and Accelerators Department, Nuclear Research Center, Atomic Energy Authority, Cairo, (Egypt)

    1996-03-01

    A new design of a broad beam RF ion source is made to be capable to deliver wide and uniform beam with currents reaching (100 {mu} A up to 30 mA) at extraction voltages (200 V up to 2 kV). Its plasma intensifying system is made with the addition of electrons from an immersed filament in the discharge and axial magnetic field (70 up to 300 G). A uniform beam distribution is made with a planner graphite cathode which has a number of holes arranged to produce perveance matching with the normal Gaussian distribution of the beam density. These holes are arranged in a consequent orbits with equal distance between the adjacent holes in each orbit. These holes increase in diameter with increasing the orbit radius. This allows increasing the extracted ion currents at the source outer edges and decreases its value at the source inner region; producing wide and uniform beam which is suitable for material modifications. The beam profiles are traced with electromechanical scanner and X-Y recorder. The perveance matching is found to produce a beam uniformity of =66% of its width which reaches =6 cm. The variation of the output currents are with the variation of extraction voltages, magnetic field, discharge pressure and electron injection into the plasma. The extracted current increases with the increase of the discharge pressure, RF power and magnetic field intensity. The influence of electron plasma interaction is found to have a great effect on increasing the ion currents to about four times its value without electron interaction, however, this increase is limited due to presence of breakdown at V{sub ex} > 2 kV. The simple design of this source, its cleanness due to the use of pyrex discharge bottle, easy operation and maintenance adds other features to this broad beam type ion source which makes it suitable for metallurgical applications in broad beam accelerators. 6 figs.

  10. Passivation of Ge/high-κ interface using RF Plasma nitridation

    Science.gov (United States)

    Dushaq, Ghada; Nayfeh, Ammar; Rasras, Mahmoud

    2018-01-01

    In this paper, plasma nitridation of a germanium surface using NH3 and N2 gases is performed with a standard RF-PECVD method at a substrate temperature of 250 °C. The structural and optical properties of the Ge surface have been investigated using Atomic Force Microscopy (AFM), Fourier Transform Infrared Spectroscopy (FT-IR), and Variable Angle Spectroscopic Ellipsometery (VASE). Study of the Ge (100) surface revealed that it is nitrated after plasma treatment while the GeO2 regrowth on the surface has been suppressed. Also, stability of the treated surface under air exposure is observed, where all the measurements were performed at room ambient. The electrical characteristics of fabricated Al/Ti/HfO2/GeON/p-Ge capacitors using the proposed surface treatment technique have been investigated. The C-V curves indicated a negligible hysteresis compared to ˜500 mV observed in untreated samples. Additionally, the C-V characteristic is used to extract the high-κ/Ge interface trap density using the most commonly used methods in determining the interface traps. The discussion includes the Dit calculation from the high-low frequency (Castagné-Vapaille) method and Terman (high-frequency) method. The high-low frequency method indicated a low interface trap density of ˜2.5 × 1011 eV-1.cm-2 compared to the Terman method. The J-V measurements revealed more than two orders of magnitude reduction of the gate leakage. This improved Ge interface quality is a promising low-temperature technique for fabricating high-performance Ge MOSFETs.

  11. Non-catalytic direct synthesis of graphene on Si (111) wafers by using inductively-coupled plasma chemical vapor deposition

    Science.gov (United States)

    Hwang, Sung Won; Shin, Hyunho; Lee, Bongsoo; Choi, Suk-Ho

    2016-08-01

    We employ inductively-coupled plasma chemical vapor deposition for non-catalytic growth of graphene on a Si (111) wafer or glass substrate, which is useful for practical device applications of graphene without transfer processes. At a RF power (P) of 500 W under C2H2 flow, defect-free 3 ˜ 5-layer graphene is grown on Si (111) wafers, but on glass substrate, the layer is thicker and defective, as characterized by Raman spectroscopy and electron microscopy. The graphene is produced on Si (111) for P down to 190 W whereas it is almost not formed on glass for P < 250 W, possibly resulting from the weak catalytic-reaction-like effect on glass. These results are discussed based on possible growth mechanisms.

  12. Plasma Sprayed Coatings for RF Wave Absorption

    Czech Academy of Sciences Publication Activity Database

    Nanobashvili, S.; Matějíček, Jiří; Žáček, František; Stöckel, Jan; Chráska, Pavel; Brožek, Vlastimil

    307-311, - (2002), s. 1334-1338 ISSN 0022-3115 Grant - others: COST (XE) Euratom DV4/04(TWO) Institutional research plan: CEZ:AV0Z2043910 Keywords : boron carbide, thermal spray coatings, fusion materials, RF wave absorption Subject RIV: JK - Corrosion ; Surface Treatment of Materials Impact factor: 1.730, year: 2002

  13. A study on etching of UO2, Co, and Mo surface with R.F. plasma using CF4 and O2

    International Nuclear Information System (INIS)

    Kim, Yong Soo; Seo, Yong Dae

    2003-01-01

    Recently dry decontamination/surface-cleaning technology using plasma etching has been focused in the nuclear industry. In this study, the applicability of this new dry processing technique are experimentally investigated by examining the etching reaction of UO 2 , Co, and Mo in r.f. plasma with the etchant gas of CF 4 /O 2 mixture. UO 2 is chosen as a representing material for uranium and TRU (TRans-Uranic) compounds while metallic Co and Mo are selected because they are the principal contaminants in the used metallic nuclear components such as valves and pipes made of stainless steel or Inconel. Results show that in all cases maximum etching rate is achieved when the mole fraction of O 2 in CF 4 /O 2 mixture gas is 20%, regardless of temperature and r.f. power. In case of UO 2 , the highest etching reaction rate is greater than 1000 monolayers/min. at 370 .deg. C under 150 W r.f. power which is equivalent to 0.4 μm/min. As for Co, etching reaction begins to take place significantly when the temperature exceeds 350 .deg. C. Maximum etching rate achieved at 380 .deg. C is 0.06 μm/min. Mo etching reaction takes place vigorously even at relatively low temperature and the reaction rate increases drastically with increasing temperature. Highest etching rate at 380 .deg. C is 1.9 μm /min. According to OES (Optical Emission Spectroscopy) and AES (Auger Electron Spectroscopy) analysis, primary reaction seems to be a fluorination reaction, but carbonyl compound formation reaction may assist the dominant reaction, especially in case of Co and Mo. Through this basic study, the feasibility and the applicability of plasma decontamination technique are demonstrated

  14. Characterization of In-Flight Processing of Alumina Powder Using a DC-RF Hybrid Plasma Flow System at Constant Low Operating Power

    Science.gov (United States)

    Nishiyama, H.; Onodera, M.; Igawa, J.; Nakajima, T.

    2009-12-01

    The aim of this study is to provide the optimum operating conditions for enhancing in-flight alumina particle heating as much as possible for particle spheroidization and aggregation of melted particles using a DC-RF hybrid plasma flow system even at constant low operating power based on the thermofluid considerations. It is clarified that the swirl flow and higher operating pressure enhance the particle melting and aggregation of melted particles coupled with increasing gas temperature downstream of a plasma uniformly in the radial direction at constant electrical discharge conditions.

  15. Fast wave experiments in LAPD: RF sheaths, convective cells and density modifications

    Science.gov (United States)

    Carter, T. A.; van Compernolle, B.; Martin, M.; Gekelman, W.; Pribyl, P.; van Eester, D.; Crombe, K.; Perkins, R.; Lau, C.; Martin, E.; Caughman, J.; Tripathi, S. K. P.; Vincena, S.

    2017-10-01

    An overview is presented of recent work on ICRF physics at the Large Plasma Device (LAPD) at UCLA. The LAPD has typical plasma parameters ne 1012 -1013 cm-3, Te 1 - 10 eV and B 1000 G. A new high-power ( 150 kW) RF system and fast wave antenna have been developed for LAPD. The source runs at a frequency of 2.4 MHz, corresponding to 1 - 7fci , depending on plasma parameters. Evidence of rectified RF sheaths is seen in large increases ( 10Te) in the plasma potential on field lines connected to the antenna. The rectified potential scales linearly with antenna current. The rectified RF sheaths set up convective cells of local E × B flows, measured indirectly by potential measurements, and measured directly with Mach probes. At high antenna powers substantial modifications of the density profile were observed. The plasma density profile initially exhibits transient low frequency oscillations (10 kHz). The amplitude of the fast wave fields in the core plasma is modulated at the same low frequency, suggesting fast wave coupling is affected by the density rearrangement. Work performed at the Basic Plasma Science Facility, supported jointly by the National Science Foundation and the Department of Energy.

  16. Precursor and Neutral Loss Scans in an RF Scanning Linear Quadrupole Ion Trap

    Science.gov (United States)

    Snyder, Dalton T.; Szalwinski, Lucas J.; Schrader, Robert L.; Pirro, Valentina; Hilger, Ryan; Cooks, R. Graham

    2018-03-01

    Methodology for performing precursor and neutral loss scans in an RF scanning linear quadrupole ion trap is described and compared to the unconventional ac frequency scan technique. In the RF scanning variant, precursor ions are mass selectively excited by a fixed frequency resonance excitation signal at low Mathieu q while the RF amplitude is ramped linearly to pass ions through the point of excitation such that the excited ion's m/z varies linearly with time. Ironically, a nonlinear ac frequency scan is still required for ejection of the product ions since their frequencies vary nonlinearly with the linearly varying RF amplitude. In the case of the precursor scan, the ejection frequency must be scanned so that it is fixed on a product ion m/z throughout the RF scan, whereas in the neutral loss scan, it must be scanned to maintain a constant mass offset from the excited precursor ions. Both simultaneous and sequential permutation scans are possible; only the former are demonstrated here. The scans described are performed on a variety of samples using different ionization sources: protonated amphetamine ions generated by nanoelectrospray ionization (nESI), explosives ionized by low-temperature plasma (LTP), and chemical warfare agent simulants sampled from a surface and analyzed with swab touch spray (TS). We lastly conclude that the ac frequency scan variant of these MS/MS scans is preferred due to electronic simplicity. In an accompanying manuscript, we thus describe the implementation of orthogonal double resonance precursor and neutral loss scans on the Mini 12 using constant RF voltage. [Figure not available: see fulltext.

  17. The Multipole Plasma Trap-PIC Modeling Results

    Science.gov (United States)

    Hicks, Nathaniel; Bowman, Amanda; Godden, Katarina

    2017-10-01

    A radio-frequency (RF) multipole structure is studied via particle-in-cell computer modeling, to assess the response of quasi-neutral plasma to the imposed RF fields. Several regimes, such as pair plasma, antimatter plasma, and conventional (ion-electron) plasma are considered. In the case of equal charge-to-mass ratio of plasma species, the effects of the multipole field are symmetric between positive and negative particles. In the case of a charge-to-mass disparity, the multipole RF parameters (frequency, voltage, structure size) may be chosen such that the light species (e.g. electrons) is strongly confined, while the heavy species (e.g. positive ions) does not respond to the RF field. In this case, the trapped negative space charge creates a potential well that then traps the positive species. 2D and 3D particle-in-cell simulations of this concept are presented, to assess plasma response and trapping dependences on multipole order, consequences of the formation of an RF plasma sheath, and the effects of an axial magnetic field. The scalings of trapped plasma parameters are explored in each of the mentioned regimes, to guide the design of prospective experiments investigating each. Supported by U.S. NSF/DOE Partnership in Basic Plasma Science and Engineering Grant PHY-1619615.

  18. Lower hybrid resonance plasma heating in the LISA machine. Aquecimento do plasma na ressonancia hibrida inferior na maquina LISA

    Energy Technology Data Exchange (ETDEWEB)

    Silva, J C.X. da; Cunha Rapozo, C da [Universidade Federal Fluminense, Niteroi, RJ (Brazil). Inst. de Fisica

    1988-10-01

    Plasma of helium was obtained using microwave source of f[sub RF] = 2.45 GHz and P[sub RF] = 800 W. Temperature and electron density were investigated for plasma excited by radiofrequency of f = 30 MHz and P[sub RF] = 0.1 kw. (M.C.K.).

  19. Enhancement of hydrophobicity and tensile strength of muga silk fiber by radiofrequency Ar plasma discharge

    International Nuclear Information System (INIS)

    Gogoi, D.; Choudhury, A.J.; Chutia, J.; Pal, A.R.; Dass, N.N.; Devi, D.; Patil, D.S.

    2011-01-01

    The hydrophobicity and tensile strength of muga silk fiber are investigated using radiofrequency (RF) Ar plasma treatment at various RF powers (10-30 W) and treatment times (5-20 min). The Ar plasma is characterized using self-compensated Langmuir and emissive probe. The ion energy is observed to play an important role in determining the tensile strength and hydrophobicity of the plasma treated fibers. The chemical compositions of the fibers are observed to be affected by the increase in RF power rather than treatment time. XPS study reveals that the ions that are impinging on the substrates are mainly responsible for the cleavage of peptide bond and side chain of amino acid groups at the surface of the fibers. The observed properties (tensile strength and hydrophobicity) of the treated fibers are found to be dependent on their variation in atomic concentration and functional composition at the surfaces. All the treated muga fibers exhibit almost similar thermal behavior as compared to the virgin one. At RF power of 10 W and treatment time range of 5-20 min, the treated fibers exhibit properties similar to that of the virgin one. Higher RF power (30 W) and the increase in treatment time deteriorate the properties of the fibers due to incorporation of more surface roughness caused by sufficiently high energetic ion bombardment. The properties of the plasma treated fibers are attempted to correlate with the XPS analysis and their surface morphologies.

  20. Fast, kinetically self-consistent simulation of RF modulated plasma boundary sheaths

    International Nuclear Information System (INIS)

    Shihab, Mohammed; Ziegler, Dennis; Brinkmann, Ralf Peter

    2012-01-01

    A mathematical model is presented which enables the efficient, kinetically self-consistent simulation of RF modulated plasma boundary sheaths in all technically relevant discharge regimes. It is defined on a one-dimensional geometry where a Cartesian x-axis points from the electrode or wall at x E ≡ 0 towards the plasma bulk. An arbitrary endpoint x B is chosen ‘deep in the bulk’. The model consists of a set of kinetic equations for the ions, Boltzmann's relation for the electrons and Poisson's equation for the electrical field. Boundary conditions specify the ion flux at x B and a periodically—not necessarily harmonically—modulated sheath voltage V(t) or sheath charge Q(t). The equations are solved in a statistical sense. However, it is not the well-known particle-in-cell (PIC) scheme that is employed, but an alternative iterative algorithm termed ensemble-in-spacetime (EST). The basis of the scheme is a discretization of the spacetime, the product of the domain [x E , x B ] and the RF period [0, T]. Three modules are called in a sequence. A Monte Carlo module calculates the trajectories of a large set of ions from their start at x B until they reach the electrode at x E , utilizing the potential values on the nodes of the spatio-temporal grid. A harmonic analysis module reconstructs the Fourier modes n im (x) of the ion density n i (x, t) from the calculated trajectories. A field module finally solves the Boltzmann-Poisson equation with the calculated ion densities to generate an updated set of potential values for the spatio-temporal grid. The iteration is started with the potential values of a self-consistent fluid model and terminates when the updates become sufficiently small, i.e. when self-consistency is achieved. A subsequent post-processing determines important quantities, in particular the phase-resolved and phase-averaged values of the ion energy and angular distributions and the total energy flux at the electrode. A drastic reduction of the

  1. Optimization of silicon oxynitrides by plasma-enhanced chemical vapor deposition for an interferometric biosensor

    Science.gov (United States)

    Choo, Sung Joong; Lee, Byung-Chul; Lee, Sang-Myung; Park, Jung Ho; Shin, Hyun-Joon

    2009-09-01

    In this paper, silicon oxynitride layers deposited with different plasma-enhanced chemical vapor deposition (PECVD) conditions were fabricated and optimized, in order to make an interferometric sensor for detecting biochemical reactions. For the optimization of PECVD silicon oxynitride layers, the influence of the N2O/SiH4 gas flow ratio was investigated. RF power in the PEVCD process was also adjusted under the optimized N2O/SiH4 gas flow ratio. The optimized silicon oxynitride layer was deposited with 15 W in chamber under 25/150 sccm of N2O/SiH4 gas flow rates. The clad layer was deposited with 20 W in chamber under 400/150 sccm of N2O/SiH4 gas flow condition. An integrated Mach-Zehnder interferometric biosensor based on optical waveguide technology was fabricated under the optimized PECVD conditions. The adsorption reaction between bovine serum albumin (BSA) and the silicon oxynitride surface was performed and verified with this device.

  2. Effect of surface microstructure and wettability on plasma protein adsorption to ZnO thin films prepared at different RF powers

    Energy Technology Data Exchange (ETDEWEB)

    Huang Zhanyun; Chen Min; Chen Dihu [State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-Sen University, Guangzhou 510275 (China); Pan Shirong, E-mail: stscdh@mail.sysu.edu.c [Artificial Heart Lab, the 1st Affiliate Hospital of Sun Yat-Sen University, Guangzhou 510080 (China)

    2010-10-01

    In this paper, the adsorption behavior of plasma proteins on the surface of ZnO thin films prepared by radio frequency (RF) sputtering under different sputtering powers was studied. The microstructures and surface properties of the ZnO thin films were investigated by x-ray diffraction (XRD), scanning electron microscopy (SEM), UV-visible optical absorption spectroscopy and contact angle techniques. The results show that the ZnO thin films have better orientation of the (0 0 2) peak with increasing RF power, especially at around 160 W, and the optical band gap of the ZnO films varies from 3.2 to 3.4 eV. The contact angle test carried out by the sessile drop technique denoted a hydrophobic surface of the ZnO films, and the surface energy and adhesive work of the ZnO thin films decreased with increasing sputtering power. The amounts of human fibrinogen (HFG) and human serum albumin (HSA) adsorbing on the ZnO films and reference samples were determined by using enzyme-linked immunosorbent assay (ELISA). The results show that fewer plasma proteins and a smaller HFG/HSA ratio adsorb on the ZnO thin films' surface.

  3. Surface improvement and biocompatibility of TiAl{sub 24}Nb{sub 10} intermetallic alloy using rf plasma nitriding

    Energy Technology Data Exchange (ETDEWEB)

    Abd El-Rahman, A.M. [Physics Department, Faculty of Science, Sohag University (Egypt)], E-mail: ahmedphys96@hotmail.com; Maitz, M.F. [Institut fuer Ionenstrahlphysik und Materialforschung, Forschungszentrum Dresden Rossendorf (Germany); Kassem, M.A. [Department of Materials and Metals Engineering, Faculty of Petroleum and Mining Engineering, Suez Canal University (Egypt); El-Hossary, F.M. [Physics Department, Faculty of Science, Sohag University (Egypt); Prokert, F.; Reuther, H.; Pham, M.T.; Richter, E. [Institut fuer Ionenstrahlphysik und Materialforschung, Forschungszentrum Dresden Rossendorf (Germany)

    2007-09-30

    The present work describes the surface improvement and biocompatibility of TiAl{sub 24}Nb{sub 10} intermetallic alloy using rf plasma nitriding. The nitriding process was carried out at different plasma power from 400 W to 650 W where the other plasma conditions were fixed. Grazing incidence X-ray diffractometry (GIXRD), Auger electron spectroscopy (AES), tribometer and a nanohardness tester were employed to characterize the nitrided layer. Further potentiodynamic polarization method was used to describe the corrosion behavior of the un-nitrided and nitrided alloy. It has been found that the Vickers hardness (HV) and corrosion resistance values of the nitrided layers increase with increasing plasma power while the wear rates of the nitrided layers reduce by two orders of magnitude as compared to those of the un-nitrided layer. This improvement in surface properties of the intermetallic alloy is due to formation of a thin modified layer which is composed of titanium nitride in the alloy surface. Moreover, all modified layers were tested for their sustainability as a biocompatible material. Concerning the application area of biocompatibility, the present treated alloy show good surface properties especially for the nitrided alloy at low plasma power of 400 W.

  4. Verification of high voltage rf capacitive sheath models with particle-in-cell simulations

    Science.gov (United States)

    Wang, Ying; Lieberman, Michael; Verboncoeur, John

    2009-10-01

    Collisionless and collisional high voltage rf capacitive sheath models were developed in the late 1980's [1]. Given the external parameters of a single-frequency capacitively coupled discharge, plasma parameters including sheath width, electron and ion temperature, plasma density, power, and ion bombarding energy can be estimated. One-dimensional electrostatic PIC codes XPDP1 [2] and OOPD1 [3] are used to investigate plasma behaviors within rf sheaths and bulk plasma. Electron-neutral collisions only are considered for collisionless sheaths, while ion-neutral collisions are taken into account for collisional sheaths. The collisionless sheath model is verified very well by PIC simulations for the rf current-driven and voltage-driven cases. Results will be reported for collisional sheaths also. [1] M. A. Lieberman, IEEE Trans. Plasma Sci. 16 (1988) 638; 17 (1989) 338 [2] J. P. Verboncoeur, M. V. Alves, V. Vahedi, and C. K. Birdsall, J. Comp. Phys. 104 (1993) 321 [3] J. P. Verboncoeur, A. B. Langdon and N. T. Gladd, Comp. Phys. Comm. 87 (1995) 199

  5. Modelling of plasma-antenna coupling and non-linear radio frequency wave-plasma-wall interactions in the magnetized plasma device under ion cyclotron range of frequencies

    International Nuclear Information System (INIS)

    Lu, LingFeng

    2016-01-01

    Ion Cyclotron Resonant Heating (ICRH) by waves in 30-80 MHz range is currently used in magnetic fusion plasmas. Excited by phased arrays of current straps at the plasma periphery, these waves exist under two polarizations. The Fast Wave tunnels through the tenuous plasma edge and propagates to its center where it is absorbed. The parasitically emitted Slow Wave only exists close to the launchers. How much power can be coupled to the center with 1 A current on the straps? How do the emitted radiofrequency (RF) near and far fields interact parasitically with the edge plasma via RF sheath rectification at plasma-wall interfaces? To address these two issues simultaneously, in realistic geometry over the size of ICRH antennas, this thesis upgraded and tested the Self-consistent Sheaths and Waves for ICH (SSWICH) code. SSWICH couples self-consistently RF wave propagation and Direct Current (DC) plasma biasing via non-linear RF and DC sheath boundary conditions (SBCs) at plasma/wall interfaces. Its upgrade is full wave and was implemented in two dimensions (toroidal/radial). New SBCs coupling the two polarizations were derived and implemented along shaped walls tilted with respect to the confinement magnetic field. Using this new tool in the absence of SBCs, we studied the impact of a density decaying continuously inside the antenna box and across the Lower Hybrid (LH) resonance. Up to the memory limits of our workstation, the RF fields below the LH resonance changed with the grid size. However the coupled power spectrum hardly evolved and was only weakly affected by the density inside the box. In presence of SBCs, SSWICH-FW simulations have identified the role of the fast wave on RF sheath excitation and reproduced some key experimental observations. SSWICH-FW was finally adapted to conduct the first electromagnetic and RF-sheath 2D simulations of the cylindrical magnetized plasma device ALINE. (author) [fr

  6. Langmuir probe studies on a RF ion source for NBI

    International Nuclear Information System (INIS)

    McNeely, P.; Heineman, B.; Kraus, W.; Riedl, R.; Speth, E.; Vollmer, O.

    2001-01-01

    IPP Garching has been developing a RF ion source for H - production. In order to improve the data quality a new scanning probe system with passive RF compensation has been installed on the Type VI ion source on the BATMAN test stand. Using this probe, measurements have been carried out to study changes to the plasma parameters (electron density, electron temperature, and plasma potential) due to variation in the source operating conditions. The data were collected at a source pressure of 0.5 Pa and with 60±5 kW applied RF power. Presented are some of the results of these measurements, focusing on the effect of: argon seeding, addition of Cs to the source, and the newly added Faraday screen. The electron density behaves in a fashion that agrees with the theory of ambipolar diffusion. Typically there is little change to the average electron energy observed regardless of which effect is considered. The plasma potential shows the most significant changes with external source conditions, both in value for all cases and shape when the Faraday screen was added

  7. A study on rare gas - oxygen reactions excited by low temperature plasma

    Energy Technology Data Exchange (ETDEWEB)

    Ogawa, Hiroaki; Kiuchi, Kiyoshi; Saburi, Tei; Fukaya, Kiyoshi [Japan Atomic Energy Research Inst., Tokai, Ibaraki (Japan). Tokai Research Establishment

    2001-03-01

    The concentration of radioactive rare gases like Xe and Kr in nuclear fuels on PWRs and BWRs increases promptly with dependent on the burn-up ratio. These gases are affect to the long performance of nuclear fuel elements due to accumulate in gap between cladding and fuel, because it has the low thermal conductivity. It is also required to develop the practical means to correct these gases including in the off-gas in nuclear plants for inhibiting the environmental pollution. On the present study, we carried out the fundamental research to evaluate the chemical reactivity of these gases under heavy irradiation. We proposed the new excitation mechanism of these gases by expecting the formation of low energy plasma under irradiation. The chemical reactivity on rare gas-oxygen system was examined by using the low energy plasma driven reaction apparatus installed the RF excitation source. The density of electrons and lower pressure limit for the RF excitation was depended on the ionization energy of each gas. It is clarified that Xe is easy to form gaseous oxide due to the high excitation efficiency in low energy plasma. (author)

  8. SOL RF physics modelling in Europe, in support of ICRF experiments

    Directory of Open Access Journals (Sweden)

    Colas Laurent

    2017-01-01

    Full Text Available A European project was undertaken to improve the available SOL ICRF physics simulation tools and confront them with measurements. This paper first reviews code upgrades within the project. Using the multi-physics finite element solver COMSOL, the SSWICH code couples RF full-wave propagation with DC plasma biasing over “antenna-scale” 2D (toroidal/radial domains, via non-linear RF and DC sheath boundary conditions (SBCs applied at shaped plasma-facing boundaries. For the different modules and associated SBCs, more elaborate basic research in RF-sheath physics, SOL turbulent transport and applied mathematics, generally over smaller spatial scales, guides code improvement. The available simulation tools were applied to interpret experimental observations on various tokamaks. We focus on robust qualitative results common to several devices: the spatial distribution of RF-induced DC bias; left-right asymmetries over strap power unbalance; parametric dependence and antenna electrical tuning; DC SOL biasing far from the antennas, and RF-induced density modifications. From these results we try to identify the relevant physical ingredients necessary to reproduce the measurements, e.g. accurate radiated field maps from 3D antenna codes, spatial proximity effects from wave evanescence in the near RF field, or DC current transport. Pending issues towards quantitative predictions are also outlined.

  9. Powder free PECVD epitaxial silicon by plasma pulsing or increasing the growth temperature

    Science.gov (United States)

    Chen, Wanghua; Maurice, Jean-Luc; Vanel, Jean-Charles; Cabarrocas, Pere Roca i.

    2018-06-01

    Crystalline silicon thin films are promising candidates for low cost and flexible photovoltaics. Among various synthesis techniques, epitaxial growth via low temperature plasma-enhanced chemical vapor deposition is an interesting choice because of two low temperature related benefits: low thermal budget and better doping profile control. However, increasing the growth rate is a tricky issue because the agglomeration of clusters required for epitaxy leads to powder formation in the plasma. In this work, we have measured precisely the time evolution of the self-bias voltage in silane/hydrogen plasmas at millisecond time scale, for different values of the direct-current bias voltage applied to the radio frequency (RF) electrode and growth temperatures. We demonstrate that the decisive factor to increase the epitaxial growth rate, i.e. the inhibition of the agglomeration of plasma-born clusters, can be obtained by decreasing the RF OFF time or increasing the growth temperature. The influence of these two parameters on the growth rate and epitaxial film quality is also presented.

  10. Surface plasma source with saddle antenna radio frequency plasma generator.

    Science.gov (United States)

    Dudnikov, V; Johnson, R P; Murray, S; Pennisi, T; Piller, C; Santana, M; Stockli, M; Welton, R

    2012-02-01

    A prototype RF H(-) surface plasma source (SPS) with saddle (SA) RF antenna is developed which will provide better power efficiency for high pulsed and average current, higher brightness with longer lifetime and higher reliability. Several versions of new plasma generators with small AlN discharge chambers and different antennas and magnetic field configurations were tested in the plasma source test stand. A prototype SA SPS was installed in the Spallation Neutron Source (SNS) ion source test stand with a larger, normal-sized SNS AlN chamber that achieved unanalyzed peak currents of up to 67 mA with an apparent efficiency up to 1.6 mA∕kW. Control experiments with H(-) beam produced by SNS SPS with internal and external antennas were conducted. A new version of the RF triggering plasma gun has been designed. A saddle antenna SPS with water cooling is fabricated for high duty factor testing.

  11. First plasma experiments in Tore Supra with a new generation of high heat flux limiters for RF antennas

    International Nuclear Information System (INIS)

    Agarici, G.; Beaumont, B.; Bibet, Ph.; Bremond, S.; Bucalossi, J.; Colas, L.; Durocher, A.; Gargiulo, L.; Ladurelle, L.; Lombard, G.; Martin, G.; Mollard, P.

    2000-01-01

    During the 1997 and 1998 Tore Supra shutdown, a first set of new antenna guard limiters was installed on one of the three ion cyclotron resonance heating (ICRH) antennas of Tore Supra. This limiter, which was one of the main technological studies of the 1998 campaign, was widely experimented in real plasma conditions, thus allowing the validation in situ, for the first time, of the technology of active metal casting (AMC) for plasma facing components. The huge improvement in the thermal response of the new limiter generation, compared to the old one, is shown on plasma pulses made identical in terms of antenna position and injected RF power profile. By using the infrared cameras installed inside Tore Supra and viewing the antennas front, the power density fluxes received by the carbon fibre composite (CFC) surface of the limiter were evaluated by correlation with the heat load tests made on the electrons beam facility of CEA/Framatome

  12. Radio-frequency plasma nitriding and nitrogen plasma immersion ion implantation of Ti-6Al-4V alloy

    International Nuclear Information System (INIS)

    Wang, S.Y.; Chu, P.K.; Tang, B.Y.; Zeng, X.C.; Wang, X.F.; Chen, Y.B.

    1997-01-01

    Nitrogen ion implantation improves the wear resistance of Ti-6Al-4V alloys by forming a hard TiN superficial passivation layer. However, the thickness of the layer formed by traditional ion implantation is typically 100-200 nm and may not be adequate for many industrial applications. We propose to use radio-frequency (RF) plasma nitriding and nitrogen plasma immersion ion implantation (PIII) to increase the layer thickness. By using a newly designed inductively coupled RF plasma source and applying a series of negative high voltage pulses to the Ti-6Al-4V samples. RF plasma nitriding and nitrogen PIII can be achieved. Our process yields a substantially thicker modified layer exhibiting more superior wear resistance characteristics, as demonstrated by data from micro-hardness testing, pin-on-disc wear testing, scanning electron microscopy (SEM), as well as Auger electron spectroscopy (AES). The performance of our newly developed inductively coupled RF plasma source which is responsible for the success of the experiments is also described. (orig.)

  13. Measurements of RF-induced sol modifications in Tore Supra tokamak

    International Nuclear Information System (INIS)

    Kubic, Martin; Gunn, James P.; Colas, Laurent; Heuraux, Stephane; Faudot, Eric

    2012-01-01

    Since spring 2011, one of the three ion cyclotron resonance heating (ICRH) antennas in the Tore Supra (TS) tokamak is equipped with a new type of Faraday screen (FS). Results from Radio Frequency (RF) simulations of the new Faraday screen suggest the innovative structure with cantilevered bars and 'shark tooth' openings significantly changes the current flow pattern on the front of the antenna which in turn reduces the RF potential and RF electrical field in particular parallel to the magnetic field lines which contributes to generating RF sheaths. Effects of the new FS operation on RF-induced scrape-off layer (SOL) modifications are studied for different plasma and antenna configurations - scans of strap power ratio imbalance, phasing, injected power and SOL density. (authors)

  14. Whispering Gallery Mode Spectroscopy as a Diagnostic for Dusty Plasmas

    International Nuclear Information System (INIS)

    Thieme, G.; Basner, R.; Ehlbeck, J.; Roepcke, J.; Maurer, H.; Kersten, H.; Davies, P. B.

    2008-01-01

    Whispering-gallery-mode spectroscopy is being assessed as a diagnostic method for the characterisation of size and chemical composition of spherical particles levitated in a plasma. With a pulsed laser whispering gallery modes (cavity resonances) are excited in individual microspheres leading to enhanced Raman scattering or fluorescence at characteristic wavelengths. This method can be used to gain specific information from the particle surface and is thus of great interest for the characterisation of layers deposited on microparticles, e.g. in molecular plasmas. We present investigations of different microparticles in air and results from fluorescent particles levitated in an Argon rf plasma.

  15. Atmospheric Pressure Plasma Induced Sterilization and Chemical Neutralization

    Science.gov (United States)

    Garate, Eusebio; Evans, Kirk; Gornostaeva, Olga; Alexeff, Igor; Lock Kang, Weng; Wood, Thomas K.

    1998-11-01

    We are studying chemical neutralization and surface decontamination using atmospheric pressure plasma discharges. The plasma is produced by corona discharge from an array of pins and a ground plane. The array is constructed so that various gases, like argon or helium, can be flowed past the pins where the discharge is initiated. The pin array can be biased using either DC, AC or pulsed discharges. Results indicate that the atmospheric plasma is effective in sterilizing surfaces with biological contaminants like E-coli and bacillus subtilus cells. Exposure times of less than four minutes in an air plasma result in a decrease in live colony counts by six orders of magnitude. Greater exposure times result in a decrease of live colony counts of up to ten orders of magnitude. The atmospheric pressure discharge is also effective in decomposing organic phosphate compounds that are simulants for chemical warfare agents. Details of the decomposition chemistry, by-product formation, and electrical energy consumption of the system will be discussed.

  16. About the EDF formation in a capacitively coupled argon plasma

    International Nuclear Information System (INIS)

    Tatanova, M; Thieme, G; Basner, R; Hannemann, M; Golubovskii, Yu B; Kersten, H

    2006-01-01

    The formation of the electron distribution function (EDF) in the bulk plasma of a capacitively coupled radio-frequency (rf) discharge in argon generated in the plasma-chemical reactor PULVA-INP is investigated experimentally and theoretically. Measurements of the EDF and internal plasma parameters were performed by means of a Langmuir probe at pressures of 0.5-100 Pa and discharge powers of 5-100 W. The observed EDFs have revealed a two-temperature behaviour at low pressures and evolved into a Maxwellian distribution at high gas pressures and large discharge powers. Theoretical determination of the EDF is based on the numerical solution of the Boltzmann kinetic equation in the local and non-local approaches under experimental conditions. The model includes elastic and inelastic electron-atom collisions and electron-electron interactions. Low electron temperatures and relatively high ionization degrees are the features of the PULVA-INP rf discharge. This leads to significant influence of the electron-electron collisions on the EDF formation. The modelled and measured distributions show good agreement in a wide range of discharge parameters, except for a range of low gas pressures, where the stochastic electron heating is intense. Additionally, mechanisms of the EDF formation in the dc and rf discharge were compared under similar discharge conditions

  17. About the EDF formation in a capacitively coupled argon plasma

    Energy Technology Data Exchange (ETDEWEB)

    Tatanova, M [Institute of Physics, Saint-Petersburg State University, ul. Ulianovskaja 1, 198504 Saint-Petersburg (Russian Federation); Thieme, G [Institut fur Niedertemperatur-Plasmaphysik, Friedrich-Ludwig-Jahn-Str 19, D-17489 Greifswald (Germany); Basner, R [Institut fur Niedertemperatur-Plasmaphysik, Friedrich-Ludwig-Jahn-Str 19, D-17489 Greifswald (Germany); Hannemann, M [Institut fur Niedertemperatur-Plasmaphysik, Friedrich-Ludwig-Jahn-Str 19, D-17489 Greifswald (Germany); Golubovskii, Yu B [Institute of Physics, Saint-Petersburg State University, ul. Ulianovskaja 1, 198504 Saint-Petersburg (Russian Federation); Kersten, H [Institut fur Niedertemperatur-Plasmaphysik, Friedrich-Ludwig-Jahn-Str 19, D-17489 Greifswald (Germany)

    2006-08-01

    The formation of the electron distribution function (EDF) in the bulk plasma of a capacitively coupled radio-frequency (rf) discharge in argon generated in the plasma-chemical reactor PULVA-INP is investigated experimentally and theoretically. Measurements of the EDF and internal plasma parameters were performed by means of a Langmuir probe at pressures of 0.5-100 Pa and discharge powers of 5-100 W. The observed EDFs have revealed a two-temperature behaviour at low pressures and evolved into a Maxwellian distribution at high gas pressures and large discharge powers. Theoretical determination of the EDF is based on the numerical solution of the Boltzmann kinetic equation in the local and non-local approaches under experimental conditions. The model includes elastic and inelastic electron-atom collisions and electron-electron interactions. Low electron temperatures and relatively high ionization degrees are the features of the PULVA-INP rf discharge. This leads to significant influence of the electron-electron collisions on the EDF formation. The modelled and measured distributions show good agreement in a wide range of discharge parameters, except for a range of low gas pressures, where the stochastic electron heating is intense. Additionally, mechanisms of the EDF formation in the dc and rf discharge were compared under similar discharge conditions.

  18. Etching properties of BLT films in CF4/Ar plasma

    International Nuclear Information System (INIS)

    Kim, Dong Pyo; Kim, Kyoung Tae; Kim, Chang Il

    2003-01-01

    CF 4 /Ar plasma mass content and etching rate behavior of BLT thin films were investigated in inductively coupled plasma (ICP) reactor as functions of CF 4 /Ar gas mixing ratio, rf power, and dc bias voltage. The variation of relative volume densities for F and Ar atoms were measured by the optical emission spectroscopy (OES). The etching rate as functions of Ar content showed the maximum of 803 A/min at 80 % Ar addition into CF 4 plasma. The presence of maximum etch rate may be explained by the concurrence of two etching mechanisms such as physical sputtering and chemical reaction. The role of Ar ion bombardment includes destruction of metal (Bi, La, Ti)-O bonds as well as support of chemical reaction of metals with fluorine atoms

  19. System integration of RF based negative ion experimental facility at IPR

    Science.gov (United States)

    Bansal, G.; Bandyopadhyay, M.; Singh, M. J.; Gahlaut, A.; Soni, J.; Pandya, K.; Parmar, K. G.; Sonara, J.; Chakraborty, A.

    2010-02-01

    The setting up of RF based negative ion experimental facility shall witness the beginning of experiments on the negative ion source fusion applications in India. A 1 MHz RF generator shall launch 100 kW RF power into a single driver on the plasma source to produce a plasma of density ~5 × 1012 cm-3. The source can deliver a negative ion beam of ~10 A with a current density of ~30 mA/cm2 and accelerated to 35 kV through an electrostatic ion accelerator. The experimental system is similar to a RF based negative ion source, BATMAN, presently operating at IPP. The subsystems for source operation are designed and procured principally from indigenous resources, keeping the IPP configuration as a base line. The operation of negative ion source is supported by many subsystems e.g. vacuum pumping system with gate valves, cooling water system, gas feed system, cesium delivery system, RF generator, high voltage power supplies, data acquisition and control system, and different diagnostics. The first experiments of negative ion source are expected to start at IPR from the middle of 2009.

  20. System integration of RF based negative ion experimental facility at IPR

    International Nuclear Information System (INIS)

    Bansal, G; Bandyopadhyay, M; Singh, M J; Gahlaut, A; Soni, J; Pandya, K; Parmar, K G; Sonara, J; Chakraborty, A

    2010-01-01

    The setting up of RF based negative ion experimental facility shall witness the beginning of experiments on the negative ion source fusion applications in India. A 1 MHz RF generator shall launch 100 kW RF power into a single driver on the plasma source to produce a plasma of density ∼5 x 10 12 cm -3 . The source can deliver a negative ion beam of ∼10 A with a current density of ∼30 mA/cm 2 and accelerated to 35 kV through an electrostatic ion accelerator. The experimental system is similar to a RF based negative ion source, BATMAN, presently operating at IPP. The subsystems for source operation are designed and procured principally from indigenous resources, keeping the IPP configuration as a base line. The operation of negative ion source is supported by many subsystems e.g. vacuum pumping system with gate valves, cooling water system, gas feed system, cesium delivery system, RF generator, high voltage power supplies, data acquisition and control system, and different diagnostics. The first experiments of negative ion source are expected to start at IPR from the middle of 2009.

  1. Review of laser-induced fluorescence methods for measuring rf- and microwave electric fields in discharges

    International Nuclear Information System (INIS)

    Gavrilenko, V.; Oks, E.

    1994-01-01

    Development of methods for measuring rf- or μ-wave electric fields E(t) = E 0 cosωt in discharge plasmas is of a great practical importance. First, these are fields used for producing rf- or μ-wave discharges. Second, the fields E(t) may represent electromagnetic waves penetrating into a plasma from the outside. This paper reviews methods for diagnostics of the fields E(t) in low temperature plasmas based on Laser-Induced Fluorescence (LIF). Compared to emission (passive) methods, LIF-methods have a higher sensitivity as well as higher spatial and temporal resolutions. Underlying physical effects may be highlighted by an example of LIF of hydrogen atoms in a plasma. After a presentation of the underlying physical principles, the review focuses on key experiments where these principles were implemented for measurements of rf- and μ-wave electric fields in various discharges

  2. Titanium nitride plasma-chemical synthesis with titanium tetrachloride raw material in the DC plasma-arc reactor

    Science.gov (United States)

    Kirpichev, D. E.; Sinaiskiy, M. A.; Samokhin, A. V.; Alexeev, N. V.

    2017-04-01

    The possibility of plasmochemical synthesis of titanium nitride is demonstrated in the paper. Results of the thermodynamic analysis of TiCl4 - H2 - N2 system are presented; key parameters of TiN synthesis process are calculated. The influence of parameters of plasma-chemical titanium nitride synthesis process in the reactor with an arc plasmatron on characteristics on the produced powders is experimentally investigated. Structure, chemical composition and morphology dependencies on plasma jet enthalpy, stoichiometric excess of hydrogen and nitrogen in a plasma jet are determined.

  3. Radio frequency energy coupling to high-pressure optically pumped nonequilibrium plasmas

    International Nuclear Information System (INIS)

    Plonjes, Elke; Palm, Peter; Lee, Wonchul; Lempert, Walter R.; Adamovich, Igor V.

    2001-01-01

    This article presents an experimental demonstration of a high-pressure unconditionally stable nonequilibrium molecular plasma sustained by a combination of a continuous wave CO laser and a sub-breakdown radio frequency (rf) electric field. The plasma is sustained in a CO/N 2 mixture containing trace amounts of NO or O 2 at pressures of P=0.4 - 1.2atm. The initial ionization of the gases is produced by an associative ionization mechanism in collisions of two CO molecules excited to high vibrational levels by resonance absorption of the CO laser radiation with subsequent vibration-vibration (V-V) pumping. Further vibrational excitation of both CO and N 2 is produced by free electrons heated by the applied rf field, which in turn produces additional ionization of these species by the associative ionization mechanism. In the present experiments, the reduced electric field, E/N, is sufficiently low to preclude field-induced electron impact ionization. Unconditional stability of the resultant cold molecular plasma is enabled by the negative feedback between gas heating and the associative ionization rate. Trace amounts of nitric oxide or oxygen added to the baseline CO/N 2 gas mixture considerably reduce the electron - ion dissociative recombination rate and thereby significantly increase the initial electron density. This allows triggering of the rf power coupling to the vibrational energy modes of the gas mixture. Vibrational level populations of CO and N 2 are monitored by infrared emission spectroscopy and spontaneous Raman spectroscopy. The experiments demonstrate that the use of a sub-breakdown rf field in addition to the CO laser allows an increase of the plasma volume by about an order of magnitude. Also, CO infrared emission spectra show that with the rf voltage turned on the number of vibrationally excited CO molecules along the line of sight increase by a factor of 3 - 7. Finally, spontaneous Raman spectra of N 2 show that with the rf voltage the vibrational

  4. Application to the conservation of RF tags in the radiation environment

    International Nuclear Information System (INIS)

    Teraura, Nobuyuki; Ito, Kunio; Takahashi, Naoki; Sakurai, Kouichi

    2011-01-01

    RF tags that are implemented RFID technology as tag has been used in various fields. Tags have been developed, such as resistance to chemicals and high temperature resistant RF tags are also used in specialized fields. The RF tag apply to the existing nuclear field, had been concerned about the effects of radiation to the RF tags. Now, since the RF tag with a goal to develop radiation-proof, we have examined, such as applying for maintenance of nuclear facilities under radiation environment. We report the results and RF tags to be radiation resistant. (author)

  5. Time effectiveness of capillary effect improvement of ramie fabrics processed by RF glow discharging

    International Nuclear Information System (INIS)

    Wang Zhiwen; Wei Weixing; He Yanhe; Zhao Yuanqing; Pan Liyiji; Li Xuemei; Shi Shaodui; Li Guangxin

    2010-01-01

    The time effectiveness of capillary effect improvement of ramie fabrics processed by RF glow discharging was studied. The ramie fabrics were processed in fulfilling with different gas (O 2 , N 2 , Ar) by different parameters (such as pressure,power and time) plasma. The capillary effect of the ramie fabrics processed by RF glow discharging was tested at different time. The results indicate that the capillary effect of ramie fabrics processed by RF glow discharging has been improved, the improvement of the capillary effect firstly decrease rapidly, then slowly, and become stable after 15 day, it indicate that improvement of the ramie fabrics capillary has good time effectiveness, and the plasma parameter for the best capillary effect improvement of ramie fabric is 100 W and 40 Pa processed 20 min by oxygen plasma. (authors)

  6. rhoCentralRfFoam: An OpenFOAM solver for high speed chemically active flows - Simulation of planar detonations -

    Science.gov (United States)

    Gutiérrez Marcantoni, L. F.; Tamagno, J.; Elaskar, S.

    2017-10-01

    A new solver developed within the framework of OpenFOAM 2.3.0, called rhoCentralRfFoam which can be interpreted like an evolution of rhoCentralFoam, is presented. Its use, performing numerical simulations on initiation and propagation of planar detonation waves in combustible mixtures H2-Air and H2-O2-Ar, is described. Unsteady one dimensional (1D) Euler equations coupled with sources to take into account chemical activity, are numerically solved using the Kurganov, Noelle and Petrova second order scheme in a domain discretized with finite volumes. The computational code can work with any number of species and its corresponding reactions, but here it was tested with 13 chemically active species (one species inert), and 33 elementary reactions. A gaseous igniter which acts like a shock-tube driver, and powerful enough to generate a strong shock capable of triggering exothermic chemical reactions in fuel mixtures, is used to start planar detonations. The following main aspects of planar detonations are here, treated: induction time of combustible mixtures cited above and required mesh resolutions; convergence of overdriven detonations to Chapman-Jouguet states; detonation structure (ZND model); and the use of reflected shocks to determine induction times experimentally. The rhoCentralRfFoam code was verified comparing numerical results and it was validated, through analytical results and experimental data.

  7. Sheath formation and extraction of ions from a constricted R.F ion source

    Energy Technology Data Exchange (ETDEWEB)

    Abdel-Salam, F W; Helal, A G; El-Khabeary, H; El-Merai, N T [Accelerators Dept., Nuclear Research Center, Atomic Energy Authority, Cairo, (Egypt)

    1997-12-31

    The present work investigates the plasma characteristics in a constricted R. F. ion source. The extraction of ions from the plasma boundary and sheath formation were studied. The ion source physical parameters are discussed in order to understand the physical processes occurring within the discharge region up to the extraction system. Electron temperature and density were determined using Langmuir probe. The probe current-voltage characteristics were measured for different extraction voltages (ext.) = 0,500,1000, and 1250 volt at various constant R.F. powers. The effect of R.F. power on electron temperature was deduced for a beam = plasma discharge. This revealed that for a quasi-neutral (plasma) region the electron temperature increased linearly with the R.F. Power which leads to substantial electron heating and efficient electron energy transport in this region. Applying extraction voltage, the electron temperature drops as the ionization rate increases. The sheath thickness was obtained at constant extraction voltages. The curves show that if the ion current density increased, the sheath thickness decreased while it increases by increasing extraction voltage, and it is negligible in the plasma region. 13 figs.

  8. Inductive current startup in large tokamaks with expanding minor radius and RF assist

    International Nuclear Information System (INIS)

    Borowski, S.K.

    1983-01-01

    Auxiliary RF heating of electrons before and during the current rise phase of a large tokamak, such as the Fusion Engineering Device, is examined as a means of reducing both the initiation loop voltage and resistive flux expenditure during startup. Prior to current initiation, 1 to 2 MW of electron cyclotron resonance heating power at approx.90 GHz is used to create a small volume of high conductivity plasma (T/sub e/ approx. = 100 eV, n/sub e/ approx. = 10 19 m -3 ) near the upper hybrid resonance (UHR) region. This plasma conditioning permits a small radius (a 0 approx.< 0.4 m) current channel to be established with a relatively low initial loop voltage (approx.< 25 V as opposed to approx.100 V without RF assist). During the subsequent plasma expansion and current ramp phase, additional RF power is introduced to reduce volt-second consumption due to plasma resistance. To study the preheating phase, a near classical particle and energy transport model is developed to estimate the electron heating efficiency in a currentless toroidal plasma. The model assumes that preferential electron heating at the UHR leads to the formation of an ambipolar sheath potential between the neutral plasma and the conducting vacuum vessel and limiter

  9. Surface wettability and energy effects on the biological performance of poly-3-hydroxybutyrate films treated with RF plasma

    Energy Technology Data Exchange (ETDEWEB)

    Syromotina, D.S. [Department of Experimental Physics, National Research Tomsk Polytechnic University, 634050 Tomsk (Russian Federation); Surmenev, R.A., E-mail: rsurmenev@gmail.com [Department of Experimental Physics, National Research Tomsk Polytechnic University, 634050 Tomsk (Russian Federation); Fraunhofer Institute for Interfacial Engineering and Biotechnology IGB, 70569 Stuttgart (Germany); Surmeneva, M.A. [Department of Experimental Physics, National Research Tomsk Polytechnic University, 634050 Tomsk (Russian Federation); Boyandin, A.N.; Nikolaeva, E.D. [Institute of Biophysics of Siberian Branch of Russian Academy of Sciences, 50/50 Akademgorodok, Krasnoyarsk 660036 (Russian Federation); School of Fundamental Biology and Biotechnology, Siberian Federal University, 79 Svobodny pr., 660041 Krasnoyarsk (Russian Federation); Prymak, O.; Epple, M. [Inorganic Chemistry and Center for Nanointegration Duisburg-Essen (CeNIDE), University of Duisburg-Essen, 45117 Essen (Germany); Ulbricht, M. [Technical Chemistry II and Center for Nanointegration Duisburg-Essen (CeNIDE), University of Duisburg-Essen, 45141 Essen (Germany); Oehr, C. [Fraunhofer Institute for Interfacial Engineering and Biotechnology IGB, 70569 Stuttgart (Germany); Volova, T.G. [Institute of Biophysics of Siberian Branch of Russian Academy of Sciences, 50/50 Akademgorodok, Krasnoyarsk 660036 (Russian Federation); School of Fundamental Biology and Biotechnology, Siberian Federal University, 79 Svobodny pr., 660041 Krasnoyarsk (Russian Federation)

    2016-05-01

    The surface properties of poly-3-hydroxybutyrate (P3HB) membranes were modified using oxygen and an ammonia radio-frequency (RF, 13.56 MHz) plasma. The plasma treatment procedures used in the study only affected the surface properties, including surface topography, without inducing any significant changes in the crystalline structure of the polymer, with the exception being a power level of 250 W. The wettability of the modified P3HB surfaces was significantly increased after the plasma treatment, irrespective of the treatment procedure used. It was revealed that both surface chemistry and surface roughness changes caused by the plasma treatment affected surface wettability. A treatment-induced surface aging effect was observed and resulted in an increase in the water contact angle and a decrease in the surface free energy. However, the difference in the water contact angle between the polymers that had been treated for 4 weeks and the untreated polymer surfaces was still significant. A dependence between cell adhesion and proliferation and the polar component of the surface energy was revealed. The increase in the polar component after the ammonia plasma modification significantly increased cell adhesion and proliferation on biodegradable polymer surfaces compared to the untreated P3HB and the P3HB modified using an oxygen plasma. - Highlights: • Plasma treatment affected the topography of poly(3-hydroxybutyrate) (P3HB). • Plasma treatment resulted in improvement of the surface wettability. • No alteration of the bulk properties of the polymers was observed. • The ammonia plasma treatment at 150 W improved the cell adhesion and proliferation.

  10. Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation

    International Nuclear Information System (INIS)

    Tang, D.L.; Fu, R.K.Y.; Tian, X.B.; Chu, P.K.

    2003-01-01

    Plasmas with higher density and better uniformity are produced using an improved planar radio frequency (rf) inductively coupled plasma configuration in plasma immersion ion implantation (PIII). An axial magnetic field is produced by external electromagnetic coils outside the discharge chamber. The rf power can be effectively absorbed by the plasma in the vicinity of the electron gyrofrequency due to the enhanced resonant absorption of electromagnetic waves in the whistler wave range, which can propagate nearly along the magnetic field lines thus greatly increases the plasma density. The plasma is confined by a longitudinal multipolar cusp magnetic field made of permanent magnets outside the process chamber. It can improve the plasma uniformity without significantly affecting the ion density. The plasma density can be increased from 3x10 9 to 1x10 10 cm -3 employing an axial magnetic field of several Gauss at 1000 W rf power and 5x10 -4 Torr gas pressure. The nonuniformity of the plasma density is less than 10% and can be achieved in a process chamber with a diameter of 600 mm. Since the plasma generation and process chambers are separate, plasma extinction due to the plasma sheath touching the chamber wall in high-energy PIII can be avoided. Hence, low-pressure, high-energy, and high-uniformity ion implantation can be accomplished using this setup

  11. Equiintensities of RF plasma discharges

    International Nuclear Information System (INIS)

    Vaculik, R.; Brablec, A.; Kapicka, V.; St'astny, F.

    1998-01-01

    The presented diagnostic tool can provide information of temperature distribution in the plasma. The main advantage of the method is relatively simple, low cost and quick procedure. On the other hand the individual isoline corresponds to some mean values for the wide bandwidth of interference filter. However, in real plasma sources is usually difficult to find isolated intensive line which is characterized by excitation temperature. Nevertheless, we believe that application is useful and fulfills other diagnostics methods. The visualisation of temperature field can help to understand conditions in plasmas and processes occurring there. However, the fast procedure (in real time) will be useful only. It has to be done during each experiment and carefully coupled with other diagnostic methods. It means that the device must be the low cost one. (author)

  12. Plasma nanocoating of thiophene onto MoS{sub 2} nanotubes

    Energy Technology Data Exchange (ETDEWEB)

    Türkaslan, Banu Esencan [Suleyman Demirel University, Faculty of Engineering, Department of Chemical Engineering, 32260 Isparta (Turkey); Dikmen, Sibel [Suleyman Demirel University, Faculty of Arts and Science, Department of Chemistry, 32260 Isparta (Turkey); Öksüz, Lütfi [Suleyman Demirel University, Faculty of Arts and Science, Department of Physics, 32260 Isparta (Turkey); Öksüz, Aysegul Uygun, E-mail: ayseguluygun@sdu.edu.tr [Suleyman Demirel University, Faculty of Arts and Science, Department of Chemistry, 32260 Isparta (Turkey)

    2015-12-01

    Highlights: • MoS{sub 2} nanotubes were coated with thiophene by atmospheric pressure radio-frequency (RF) glow discharge. • Among nanohybrid preparation methods, the plasma methods appear as new technology. • The effect of plasma power on PTh/MoS{sub 2} nanocomposite properties has been investigated. • When the discharge power is increased between 117 and 360 W the chemical structure of PTh is not changed and the structure of nanocomposites become more uniformly. - Abstract: MoS{sub 2} nanotubes were coated with conductive polymer thiophene by atmospheric pressure radio-frequency (RF) glow discharge. MoS{sub 2} nanotubes were prepared by thermal decomposition of hexadecylamine (HDA) intercalated laminar MoS{sub 2} precursor on anodized aluminum oxide template and the thiophene was polymerized directly on surface of these nanotubes as in situ by plasma method. The effect of plasma power on PTh/MoS{sub 2} nanocomposite properties has been investigated by means of Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM and EDX), and X-ray diffraction spectroscopy (XRD). The presence of PTh bands in the FTIR spectra of PTh/MoS{sub 2} nanotube nanocomposites corresponding XRD results indicates that the polythiophene coating onto MoS{sub 2} nanotube. The chemical structure of PTh is not changed when the plasma power of discharge differ from 117 to 360 W. SEM images of nanocomposites show that when the discharge power is increased between 117 and 360 W the average diameter of PTh/MoS{sub 2} nanotube nanocomposites are changed and the structure become more uniformly.

  13. Design of RF Systems for the RTD Mission VASIMR

    International Nuclear Information System (INIS)

    Baity, F.W.; Barber, G.C.; Carter, M.D.; Chang-Diaz, F.R.; Goulding, R.H.; McCaskill, G.E.; Sparks, D.O.; Squire, J.P.

    1999-01-01

    The first flight test of the variable specific impulse magnetoplasma rocket (VASIMR) is tentatively scheduled for the Radiation and Technology Demonstration (RTD) in 2003. This mission to map the radiation environment out to several earth radii will employ both a Hall thruster and a VASIMR during its six months duration, beginning from low earth orbit. The mission will be powered by a solar array providing 12 kW of direct current electricity at 50 V. The VASIMR utilizes radiofrequency (RF) power both to generate a high-density plasma in a helicon source and to accelerate the plasma ions to high velocity by ion cyclotron resonance heating (ICRH). The VASIMR concept is being developed by the National Aeronautics and Space Administration (NASA) in collaboration with national laboratories and universities. Prototype plasma sources, RF amplifiers, and antennas are being developed in the experimental facilities of the Advanced Space Propulsion Laboratory (ASPL)

  14. First results on nitriding aluminium alloys in a low-pressure RF plasma

    International Nuclear Information System (INIS)

    Fewell, M.P.; Priest, J.M.; Collins, G.A.; Short, K.T.

    2000-01-01

    Full text: Aluminium alloys are now well established as materials of choice for many commercial applications, especially where strength-to-weight ratio is a critical parameter. However, their more widespread use is inhibited by their low surface hardness. For steels, similar problems can be overcome by nitriding. The nitrogen-rich surface layer has high hardness and load-bearing capacity, and is very well bonded to the substrate. The development of a similar surface-treatment process for aluminium alloys is clearly a desirable goal. It is therefore not surprising that many research groups worldwide have attempted to nitride aluminium. Much of this work studied pure aluminium, a material of no interest for structural applications. Previous investigations into nitriding aluminium alloys' had indifferent results. However, they have served to identify the key issues, which are the importance of a pre-cleaning steps to remove the surface oxide, of impurity control during the nitriding and the desirability of using as low a process temperature as possible. In all of these areas, our process using a low-pressure RF plasma is likely to be competitive. In view of this, we have undertaken a comparative study of a range of commercially available aluminium alloys. All treatments were carried out in the hot-wall nitriding reactor at ANSTO. The samples consist of disks 25mm in diameter and ∼3mm thick which were polished and ultrasonically cleaned in alcohol prior to treatment. The samples were stored in air at all times except when in the nitriding reactor. In a series of treatments, the treatment time was varied in the range 1-16 h and the temperature in the range 350-500 deg C. All treatments were preceeded by a plasma cleaning step in a H 2 /50%Ar mixture for a duration of 1.5-2.0 h while the reactor reached processing temperature. The treatments all used pure N 2 at a pressure of 0.4Pa and a nitrogen flow rate of 12μmol s -1 , with 245W of rf power at 13.56MHz applied to

  15. The Chemical Potential of Plasma Membrane Cholesterol: Implications for Cell Biology.

    Science.gov (United States)

    Ayuyan, Artem G; Cohen, Fredric S

    2018-02-27

    Cholesterol is abundant in plasma membranes and exhibits a variety of interactions throughout the membrane. Chemical potential accounts for thermodynamic consequences of molecular interactions, and quantifies the effective concentration (i.e., activity) of any substance participating in a process. We have developed, to our knowledge, the first method to measure cholesterol chemical potential in plasma membranes. This was accomplished by complexing methyl-β-cyclodextrin with cholesterol in an aqueous solution and equilibrating it with an organic solvent containing dissolved cholesterol. The chemical potential of cholesterol was thereby equalized in the two phases. Because cholesterol is dilute in the organic phase, here activity and concentration were equivalent. This equivalence allowed the amount of cholesterol bound to methyl-β-cyclodextrin to be converted to cholesterol chemical potential. Our method was used to determine the chemical potential of cholesterol in erythrocytes and in plasma membranes of nucleated cells in culture. For erythrocytes, the chemical potential did not vary when the concentration was below a critical value. Above this value, the chemical potential progressively increased with concentration. We used standard cancer lines to characterize cholesterol chemical potential in plasma membranes of nucleated cells. This chemical potential was significantly greater for highly metastatic breast cancer cells than for nonmetastatic breast cancer cells. Chemical potential depended on density of the cancer cells. A method to alter and fix the cholesterol chemical potential to any value (i.e., a cholesterol chemical potential clamp) was also developed. Cholesterol content did not change when cells were clamped for 24-48 h. It was found that the level of activation of the transcription factor STAT3 increased with increasing cholesterol chemical potential. The cholesterol chemical potential may regulate signaling pathways. Copyright © 2018. Published by

  16. Control system for RF-driven negative ion source experimental setup at HUST

    Energy Technology Data Exchange (ETDEWEB)

    Li, Dong; Wang, Xiaomin, E-mail: xm_wang@hust.edu.cn; Zhao, Peng; Liu, Kaifeng; Zhang, Lige; Yue, Haikun; Chen, Dezhi; Zuo, Chen

    2017-03-15

    Highlights: • The CompactRIO system is reliable and could achieve high-speed data collection. • The queue and event software structure allows the control code to be flexible. • TCP/IP performs better than shared variable method for mass data transmission. • The method for lowering the peak RF reflected power has been discussed and given. - Abstract: An experimental setup of RF-driven negative ion source has been built at the Huazhong University of Science and Technology (HUST). The control system for this setup is responsible for RF loading, gas feeding, filament heating, filament DC bias, data collection and Langmuir probe triggering during plasma production. To research influences on the plasma ignition of gas puff and RF power loading, the control system should be of flexible operating sequence, high-speed data collection and reliable data transmission. The general control unit (GCU) adopts a CompactRIO system, which performs high-speed data collection for gas pressure and RF power. The host control program adopts a queue and event structure for flexible operation, and TCP/IP method is applied for mass data transmission. The development of the host control program is described in detail. The test results of the shared variable and TCP/IP methods are presented, as well as data showing the advantages of the TCP/IP method. The experiment results with two different sequences of plasma production are given and discussed here.

  17. Gyrokinetic Calculations of Microinstabilities and Transport During RF H-Modes on Alcator C-Mod

    International Nuclear Information System (INIS)

    Redi, M.H.; Fiore, C.; Bonoli, P.; Bourdelle, C.; Budny, R.; Dorland, W.D.; Ernst, D.; Hammett, G.; Mikkelsen, D.; Rice, J.; Wukitch, S.

    2002-01-01

    Physics understanding for the experimental improvement of particle and energy confinement is being advanced through massively parallel calculations of microturbulence for simulated plasma conditions. The ultimate goal, an experimentally validated, global, non-local, fully nonlinear calculation of plasma microturbulence is still not within reach, but extraordinary progress has been achieved in understanding microturbulence, driving forces and the plasma response in recent years. In this paper we discuss gyrokinetic simulations of plasma turbulence being carried out to examine a reproducible, H-mode, RF heated experiment on the Alcator CMOD tokamak3, which exhibits an internal transport barrier (ITB). This off axis RF case represents the early phase of a very interesting dual frequency RF experiment, which shows density control with central RF heating later in the discharge. The ITB exhibits steep, spontaneous density peaking: a reduction in particle transport occurring without a central particle source. Since the central temperature is maintained while the central density is increasing, this also suggests a thermal transport barrier exists. TRANSP analysis shows that ceff drops inside the ITB. Sawtooth heat pulse analysis also shows a localized thermal transport barrier. For this ICRF EDA H-mode, the minority resonance is at r/a * 0.5 on the high field side. There is a normal shear profile, with q monotonic

  18. RF Wave Simulation Using the MFEM Open Source FEM Package

    Science.gov (United States)

    Stillerman, J.; Shiraiwa, S.; Bonoli, P. T.; Wright, J. C.; Green, D. L.; Kolev, T.

    2016-10-01

    A new plasma wave simulation environment based on the finite element method is presented. MFEM, a scalable open-source FEM library, is used as the basis for this capability. MFEM allows for assembling an FEM matrix of arbitrarily high order in a parallel computing environment. A 3D frequency domain RF physics layer was implemented using a python wrapper for MFEM and a cold collisional plasma model was ported. This physics layer allows for defining the plasma RF wave simulation model without user knowledge of the FEM weak-form formulation. A graphical user interface is built on πScope, a python-based scientific workbench, such that a user can build a model definition file interactively. Benchmark cases have been ported to this new environment, with results being consistent with those obtained using COMSOL multiphysics, GENRAY, and TORIC/TORLH spectral solvers. This work is a first step in bringing to bear the sophisticated computational tool suite that MFEM provides (e.g., adaptive mesh refinement, solver suite, element types) to the linear plasma-wave interaction problem, and within more complicated integrated workflows, such as coupling with core spectral solver, or incorporating additional physics such as an RF sheath potential model or kinetic effects. USDoE Awards DE-FC02-99ER54512, DE-FC02-01ER54648.

  19. RF Rectification on LAPD and NSTX: the relationship between rectified currents and potentials

    Science.gov (United States)

    Perkins, R. J.; Carter, T.; Caughman, J. B.; van Compernolle, B.; Gekelman, W.; Hosea, J. C.; Jaworski, M. A.; Kramer, G. J.; Lau, C.; Martin, E. H.; Pribyl, P.; Tripathi, S. K. P.; Vincena, S.

    2017-10-01

    RF rectification is a sheath phenomenon important in the fusion community for impurity injection, hot spot formation on plasma-facing components, modifications of the scrape-off layer, and as a far-field sink of wave power. The latter is of particular concern for the National Spherical Torus eXperiment (NSTX), where a substantial fraction of the fast-wave power is lost to the divertor along scrape-off layer field lines. To assess the relationship between rectified currents and rectified voltages, detailed experiments have been performed on the Large Plasma Device (LAPD). An electron current is measured flowing out of the antenna and into the limiters, consistent with RF rectification with a higher RF potential at the antenna. The scaling of this current with RF power will be presented. The limiters are also floated to inhibit this DC current; the impact of this change on plasma-potential and wave-field measurements will be shown. Comparison to data from divertor probes in NSTX will be made. These experiments on a flexible mid-sized experiment will provide insight and guidance into the effects of ICRF on the edge plasma in larger fusion experiments. Funded by the DOE OFES (DE-FC02-07ER54918 and DE-AC02-09CH11466), NSF (NSF- PHY 1036140), and the Univ. of California (12-LR- 237124).

  20. State-space modeling of the radio frequency inductively-coupled plasma generator

    International Nuclear Information System (INIS)

    Dewangan, Rakesh Kumar; Punjabi, Sangeeta B; Mangalvedekar, H A; Lande, B K; Joshi, N K; Barve, D N

    2010-01-01

    Computational fluid dynamics models of RF-ICP are useful in understanding the basic transport phenomenon in an ICP torch under a wide variety of operating conditions. However, these models lack the ability to evaluate the effects of the plasma condition on the RF generator. In this paper, simulation of an induction plasma generator has been done using state space modelling by considering inductively coupled plasma as a part of RF network .The time dependent response of the RF-ICP generator circuit to given input excitation has been computed by extracting the circuit's state-space variables and their constraint matrices. MATLAB 7.1 software has been used to solve the state equations. The values of RF coil current, frequency and plasma power has been measured experimentally also at different plate bias voltage. The simulated model is able to predict RF coil current, frequency, plasma power, overall efficiency of the generator. The simulated and measured values are in agreement with each other. This model can prove useful as a design tool for the Induction plasma generator.

  1. theoretical and experimental study of plasma acceleration by means of R.F. and static magnetic field gradient

    International Nuclear Information System (INIS)

    Bardet, Rene; Consoli, Terenzio; Geller, Richard

    1964-09-01

    In the first part of the paper, the theory of the physical mechanism of ion dragging by accelerated electrons due to the superimposition of the gradient of a electromagnetic field and the gradient of a static magnetic field, is described. The resulting trajectory of the electrons is a helicoid and one shows the variations of the diameter and the path of the spirals along the axis as a function of the difference between the gyrofrequency and the applied R.F. frequency. The ion acceleration is due to an electron space charge effect. The grouping of the equations of the electronic and ionic fluid motions leads to the introduction of a tensor mass: along the x and y direction the transverse motion of the fluid is controlled by the relativistic mass of electrons whereas along the z direction the axial motion is determined by the ionic mass. Then we deduce physical consequences of the theoretical study and give three experimental evidences. The second part of the paper is devoted to the experimental device called Pleiade which allowed us to verify some of the theoretical predictions. Pleiade produces a D.C. operating plasma beam in which the electrons exhibit radially oriented energies whereas the ionic energy is mainly axial. The experimental results indicate that the energy of the particles is in the keV range. In the third part we deal with the reflecting properties of the device. We show that the R.F. static magnetic field gradients are not only capable of accelerating a Plasma beam along the axially decreasing magnetic field, but are also capable of stopping and reflecting such a beam when the latter is moving along an axially increasing magnetic field. We describe finally a plasma accumulation experiment in which two symmetric structures form simultaneously an accelerator and a 'dynamic mirror' for the particles. Evidence of accumulation is given. (authors) [fr

  2. Etching of uranium dioxide in nitrogen trifluoride RF plasma glow discharge

    Science.gov (United States)

    Veilleux, John Mark

    1999-10-01

    A series of room temperature, low pressure (10.8 to 40 Pa), low power (25 to 210 W) RF plasma glow discharge experiments with UO2 were conducted to demonstrate that plasma treatment is a viable method for decontaminating UO2 from stainless steel substrates. Experiments were conducted using NF3 gas to decontaminate depleted uranium dioxide from stainless-steel substrates. Results demonstrated that UO2 can be completely removed from stainless-steel substrates after several minutes processing at under 200 W. At 180 W and 32.7 Pa gas pressure, over 99% of all UO2 in the samples was removed in just 17 minutes. The initial etch rate in the experiments ranged from 0.2 to 7.4 mum/min. Etching increased with the plasma absorbed power and feed gas pressure in the range of 10.8 to 40 Pa. A different pressure effect on UO2 etching was also noted below 50 W in which etching increased up to a maximum pressure, ˜23 Pa, then decreased with further increases in pressure. A computer simulation, CHEMKIN, was applied to predict the NF3 plasma species in the experiments. The code was validated first by comparing its predictions of the NF3 plasma species with mass spectroscopy etching experiments of silicon. The code predictions were within +/-5% of the measured species concentrations. The F atom radicals were identified as the primary etchant species, diffusing from the bulk plasma to the UO2 surface and reacting to form a volatile UF6, which desorbed into the gas phase to be pumped away. Ions created in the plasma were too low in concentration to have a major effect on etching, but can enhance the etch rate by removing non-volatile reaction products blocking the reaction of F with UO2. The composition of these non-volatile products were determined based on thermodynamic analysis and the electronic structure of uranium. Analysis identified possible non-volatile products as the uranium fluorides, UF2-5, and certain uranium oxyfluorides UO2F, UO2F2, UOF3, and UOF 4 which form over the

  3. Optical emission spectroscopy during fabrication of indium-tin-oxynitride films by RF-sputtering

    International Nuclear Information System (INIS)

    Koufaki, M.; Sifakis, M.; Iliopoulos, E.; Pelekanos, N.; Modreanu, M.; Cimalla, V.; Ecke, G.; Aperathitis, E.

    2006-01-01

    Indium-tin-oxide (ITO) and indium-tin-oxynitride (ITON) films have been deposited on glass by rf-sputtering from an ITO target, using Ar plasma and N 2 plasma, respectively, and different rf-power. Optical emission spectroscopy (OES) was employed to identify the species present in the plasma and to correlate them with the properties of the ITO and ITON thin films. Emission lines of ionic In could only be detected in N 2 plasma, whereas in the Ar plasma additional lines corresponding to atomic In and InO, were detected. The deposition rate of thin films was correlated with the In species, rather than the nitrogen species, emission intensity in the plasma. The higher resistivity and lower carrier concentration of the ITON films, as compared to the respective properties of the ITO films, were attributed to the incorporation of nitrogen, instead of oxygen, in the ITON structure

  4. Reduced chemical warfare agent sorption in polyurethane-painted surfaces via plasma-enhanced chemical vapor deposition of perfluoroalkanes.

    Science.gov (United States)

    Gordon, Wesley O; Peterson, Gregory W; Durke, Erin M

    2015-04-01

    Perfluoralkalation via plasma chemical vapor deposition has been used to improve hydrophobicity of surfaces. We have investigated this technique to improve the resistance of commercial polyurethane coatings to chemicals, such as chemical warfare agents. The reported results indicate the surface treatment minimizes the spread of agent droplets and the sorption of agent into the coating. The improvement in resistance is likely due to reduction of the coating's surface free energy via fluorine incorporation, but may also have contributing effects from surface morphology changes. The data indicates that plasma-based surface modifications may have utility in improving chemical resistance of commercial coatings.

  5. Design for the National RF Test Facility at ORNL

    International Nuclear Information System (INIS)

    Gardner, W.L.; Hoffman, D.J.; Becraft, W.R.

    1983-01-01

    Conceptual and preliminary engineering design for the National RF Test Facility at Oak Ridge National Laboratory (ORNL) has been completed. The facility will comprise a single mirror configuration embodying two superconducting development coils from the ELMO Bumpy Torus Proof-of-Principle (EBT-P) program on either side of a cavity designed for full-scale antenna testing. The coils are capable of generating a 1.2-T field at the axial midpoint between the coils separated by 1.0 m. The vacuum vessel will be a stainless steel, water-cooled structure having an 85-cm-radius central cavity. The facility will have the use of a number of continuous wave (cw), radio-frequency (rf) sources at levels including 600 kW at 80 MHz and 100 kW at 28 GHz. Several plasma sources will provide a wide range of plasma environments, including densities as high as approx. 5 x 10 13 cm -3 and temperatures on the order of approx. 10 eV. Furthermore, a wide range of diagnostics will be available to the experimenter for accurate appraisal of rf testing

  6. Fundamental aspects of plasma chemical physics transport

    CERN Document Server

    Capitelli, Mario; Laricchiuta, Annarita

    2013-01-01

    Fundamental Aspects of Plasma Chemical Physics: Tranpsort develops basic and advanced concepts of plasma transport to the modern treatment of the Chapman-Enskog method for the solution of the Boltzmann transport equation. The book invites the reader to consider actual problems of the transport of thermal plasmas with particular attention to the derivation of diffusion- and viscosity-type transport cross sections, stressing the role of resonant charge-exchange processes in affecting the diffusion-type collision calculation of viscosity-type collision integrals. A wide range of topics is then discussed including (1) the effect of non-equilibrium vibrational distributions on the transport of vibrational energy, (2) the role of electronically excited states in the transport properties of thermal plasmas, (3) the dependence of transport properties on the multitude of Saha equations for multi-temperature plasmas, and (4) the effect of the magnetic field on transport properties. Throughout the book, worked examples ...

  7. Measurement of toroidal plasma current in RF heated helical plasmas

    International Nuclear Information System (INIS)

    Besshou, Sakae

    1993-01-01

    This report describes the measurement of toroidal plasma current by a semiflexible Rogowski coil in a helical vacuum chamber. A Rogowski coil measures the toroidal plasma current with a resolution of 0.1 kA, frequency range of up to 1 kHz and sensitivity of 6.5 x 10 -9 V · s/A. We measured the spontaneous toroidal plasma current (from -1.2 to +1.2 kA) under electron cyclotron resonance heating at 0.94 T toroidal field in the Heliotron-E device. We found that the measured direction of toroidal plasma current changes its sign as in the predicted behavior of a neoclassical diffusion-driven bootstrap current, depending on the horizontal position of the plasma column. We explain the observed plasma currents in terms of the compound phenomenon of an ohmic current and a neoclassical diffusion-driven current. The magnitude of the neoclassical current component is smaller than the value predicted by a collisionless neoclassical theory. (author)

  8. Investigations of electropositive and electronegative RF discharges

    International Nuclear Information System (INIS)

    Bryant, P.M.

    2000-01-01

    Electronegative RF discharges are extensively used in the semi-conductor industry for material processing. Despite this the subject of electronegative RF discharges has been largely neglected. The aim of this thesis is to investigate a RF oxygen discharge by mass/energy spectrometry, a retarding field analyser and an actively compensated Langmuir probe. Measurements are also obtained in argon for comparison. In this thesis pure oxygen will be used as this has relatively simple discharge chemistry with most of the rate constants well known. Ion energy analysis (Chapter 3) show the discharge to contract into the centre of the chamber at low pressures in both gases. The expected thinner peak of the oxygen ion energy distribution was not observed, this is shown to be due to RF modulation of the positive ions with collisions playing a role. The dominant positive ion in the discharge bulk and colliding in the sheath in oxygen was found to be O 2 + with less than 10% O + over the range of pressure investigated (Chapter 4). Various minor ions such as O 3 + and O 4 + were also observed. By actively compensating a Langmuir probe for the first three plasma harmonics it is shown that it is unnecessary to compensate when the amplitude of a given harmonic is comparable to the electron temperature (Chapter 5). A study of Langmuir probe measurements in argon (Chapter 7) has shown that the use of the collisionless Alien, Boyd and Reynolds theory leads to discrepancies in the measured electron densities. The correct density can be obtained by using the perturbation method of Shih and Levi, this corrects for ion-neutral collisions in electropositive plasmas only. This theory is extended to electronegative plasmas (Chapter 6) so that measurements of the negative ion density obtained from the collisionless theory of Arnemiya, Annaratone and Alien can be corrected. Langmuir probe measurements in oxygen indicate a peak in the negative ion density at around 3Pa and are found to be in good

  9. Assessment of quasi-linear effect of RF power spectrum for enabling lower hybrid current drive in reactor plasmas

    Science.gov (United States)

    Cesario, Roberto; Cardinali, Alessandro; Castaldo, Carmine; Amicucci, Luca; Ceccuzzi, Silvio; Galli, Alessandro; Napoli, Francesco; Panaccione, Luigi; Santini, Franco; Schettini, Giuseppe; Tuccillo, Angelo Antonio

    2017-10-01

    The main research on the energy from thermonuclear fusion uses deuterium plasmas magnetically trapped in toroidal devices. To suppress the turbulent eddies that impair thermal insulation and pressure tight of the plasma, current drive (CD) is necessary, but tools envisaged so far are unable accomplishing this task while efficiently and flexibly matching the natural current profiles self-generated at large radii of the plasma column [1-5]. The lower hybrid current drive (LHCD) [6] can satisfy this important need of a reactor [1], but the LHCD system has been unexpectedly mothballed on JET. The problematic extrapolation of the LHCD tool at reactor graded high values of, respectively, density and temperatures of plasma has been now solved. The high density problem is solved by the FTU (Frascati Tokamak Upgrade) method [7], and solution of the high temperature one is presented here. Model results based on quasi-linear (QL) theory evidence the capability, w.r.t linear theory, of suitable operating parameters of reducing the wave damping in hot reactor plasmas. Namely, using higher RF power densities [8], or a narrower antenna power spectrum in refractive index [9,10], the obstacle for LHCD represented by too high temperature of reactor plasmas should be overcome. The former method cannot be used for routinely, safe antenna operations, Thus, only the latter key is really exploitable in a reactor. The proposed solutions are ultimately necessary for viability of an economic reactor.

  10. Improvement in the Sensitivity of PbO Doped Tin Oxide Thick Film Gas Sensor by RF and Microwave Oxygen Plasma Treatment

    Directory of Open Access Journals (Sweden)

    J. K. SRIVASTAVA

    2010-07-01

    Full Text Available In the present work efforts have been made to analyze the effect of oxygen plasma and PbO doping on the sensitivity of SnO2-based thick film gas sensor for methanol, propanol and acetone. The effect of substrate temperature on the response of dual frequency (RF and microwave plasma treated thick film sensor array has also been studied. To achieve this, three sensor arrays (each with four tin oxide sensors doped with different (1 %, 2 %, 3 % and 4 % PbO concentrations were fabricated by thick film technology and then treated with oxygen plasma for various durations (5 min, 10 min. and 15 min.. The plasma treated sensors were found to possess appreciably high sensitivity at room temperature in comparison to untreated sensor. The sensitivity showed the increasing trend with plasma exposure time and 15 minutes exposure time was found to be most suitable as the sensitivity of the plasma treated sensors for this duration were high towards all the chosen vapors with maximum (97 % value for propanol. The sensitivity of the sensors were found to be increasing gradually as PbO concentration was varied from 1- 4%.

  11. Inactivation of Gram-Negative Bacteria by Low-Pressure RF Remote Plasma Excited in N2-O2 Mixture and SF6 Gases

    Directory of Open Access Journals (Sweden)

    Ayman Al-Mariri

    2013-12-01

    Full Text Available The role of low-pressure RF plasma in the inactivation of Escherichia coli O157, Klebsiella pneumoniae, Proteus mirabilis, and Enterobacter sakazakii using N2-O2 and SF6 gases was assessed. 1×109 colony-forming units (CFUs of each bacterial isolate were placed on three polymer foils. The effects of pressure, power, distance from the source, and exposure time to plasma gases were optimized. The best conditions to inactivate the four bacteria were a 91%N2-9%O2 mixture and a 30-minute exposure time. SF6 gas was more efficient for all the tested isolates in as much as the treatment time was reduced to only three minutes. Therefore, low-pressure plasma could be used to sterilize heat and/or moisture-sensitive medical instruments.

  12. RF-Based Accelerators for HEDP Research

    CERN Document Server

    Staples, John W; Keller, Roderich; Ostroumov, Peter; Sessler, Andrew M

    2005-01-01

    Accelerator-driven High-Energy Density Physics experiments require typically 1 nanosecond, 1 microcoulomb pulses of mass 20 ions accelerated to several MeV to produce eV-level excitations in thin targets, the "warm dense matter" regime. Traditionally the province of induction linacs, RF-based acceleration may be a viable alternative with recent breakthroughs in accelerating structures and high-field superconducting solenoids. A reference design for an RF-based accelerator for HEDP research is presented using 15 T solenoids and multiple-gap RF structures configured with either multiple parallel beams (combined at the target) or a single beam and a small stacking ring that accumulates 1 microcoulomb of charge. In either case, the beam is ballistically compressed with an induction linac core providing the necessary energy sweep and injected into a plasma-neutralized drift compression channel resulting in a 1 mm radius beam spot 1 nanosecond long at a thin foil or low-density target.

  13. Double plasma system with inductively coupled source plasma and quasi-quiescent target plasma

    International Nuclear Information System (INIS)

    Massi, M.; Maciel, H.S.

    1995-01-01

    Cold plasmas have successfully been used in the plasma-assisted material processing industry. An understanding of the physicochemical mechanisms involved in the plasma-surface interaction is needed for a proper description of deposition and etching processes at material surfaces. Since these mechanisms are dependent on the plasma properties, the development of diagnostic techniques is strongly desirable for determination of the plasma parameters as well as the characterization of the electromagnetic behaviour of the discharge. In this work a dual discharge chamber, was specially designed to study the deposition of thin films via plasma polymerization process. In the Pyrex chamber an inductively coupled plasma can be excited either in the diffuse low density E-mode or in the high density H-mode. This plasma diffuses into the cylindrical stainless steel chamber which is covered with permanent magnets to produce a multidipole magnetic field configuration at the surface. By that means a double plasma is established consisting of a RF source plasma coupled to a quasi-quiescent target plasma. The preliminary results presented here refer to measurements of the profiles of plasma parameters along the central axis of the double plasma apparatus. Additionally a spectrum analysis performed by means of a Rogowski coil probe immersed into the source plasma is also presented. The discharge is made in argon with pressure varying from 10 -2 to 1 torr, and the rf from 10 to 150 W

  14. Amorphous NEA Silicon Photocathodes - A Robust RF Gun Electron Source. Final Report

    International Nuclear Information System (INIS)

    Mulhollan, Gregory A.

    2009-01-01

    Amorphous silicon (a-Si) has been shown to have great promise as a negative electron affinity visible wavelength photocathode suitable for radio frequency (RF) gun systems. The specific operating wavelength can be shifted by growing it as a germanium alloy (a-Si(1-x)Ge(x)) rather than as pure silicon. This class of photoemitters has been shown to possess a high degree of immunity to charged particle flux. Such particle flux can be a significant problem in the operation of other photocathodes in RF gun systems. Its emission characteristics in the form of current per unit area, or current density, and emission angle, or beam spread are well matched for use in RF guns. Photocathodes made of a-Si can be fabricated on a variety of substrates including those most commonly employed in RF gun systems. Such photocathodes can be made for operation in either transmission or reflection mode. By growing them utilizing radio frequency plasma enhanced chemical vapor deposition, the unit cost is quite low, the quality is high and it is straightforward to grow custom size substrates and full or limited regions to confine the electron emission to the desired area. Quality emitters have been fabricated on tantalum, molybdenum, tungsten, titanium, copper, stainless steel, float glass, borosilicate glass and gallium arsenide. In addition to performing well in dedicated test chambers, a-Si photocathodes have been shown to function well in self-contained vacuum tubes. In this employment, they are subjected to a strenuous environment. Successful operation in this configuration provides additional confidence in their application to high energy linac photoinjectors and potentially as part of reliable, low cost photocathode driven RF gun systems that could become ready replacements for the diode and triode guns used on medical accelerators. Their applications in stand-alone vacuum tubes is just beginning to be explored.

  15. Design and test of a large plasma torch for environmental recycling

    International Nuclear Information System (INIS)

    Tuszewski, M.

    1996-01-01

    A 2.5-inch inductive plasma torch has been tested with up to 600 kW rf power and with argon, nitrogen, and oxygen gases. A complete power balance is obtained from electrical, thermal, and radiation measurements. These data indicate that torch efficiencies of up to 30% are obtained with molecular gases, while efficiencies around 15% are obtained with argon. The efficiencies obtained with molecular gases almost triple earlier torch efficiencies and confirm substantially the predictions of a torch model developed during a previous CRADA. Torch efficiencies of up to 50% could be obtained in future tests with an improved rf power supply, with steam gas, and with larger torch dimensions. Future applications of the Plasma Energy Recycle and Conversion (PERC) process could include the high explosives of DOE's nuclear weapons, chemical and biological remediation, and the treatment and volume reduction of radioactive mixed waste

  16. Analysis of radiofrequency discharges in plasma

    Science.gov (United States)

    Kumar, D.; McGlynn, S.P.

    1992-08-04

    Separation of laser optogalvanic signals in plasma into two components: (1) an ionization rate change component, and (2) a photoacoustic mediated component. This separation of components may be performed even when the two components overlap in time, by measuring time-resolved laser optogalvanic signals in an rf discharge plasma as the rf frequency is varied near the electrical resonance peak of the plasma and associated driving/detecting circuits. A novel spectrometer may be constructed to make these measurements. Such a spectrometer would be useful in better understanding and controlling such processes as plasma etching and plasma deposition. 15 figs.

  17. Effects of assistant anode on planar inductively coupled magnetized argon plasma in plasma immersion ion implantation

    International Nuclear Information System (INIS)

    Tang, Deli; Chu, Paul K.

    2003-01-01

    The enhancement of planar radio frequency (RF) inductively coupled argon plasma is studied in the presence of an assistant anode and an external magnetic field at low pressure. The influence of the assistant anode and magnetic field on the efficiency of RF power absorption and plasma parameters is investigated. An external axial magnetic field is coupled into the plasma discharge region by an external electromagnetic coil outside the discharge chamber and an assistant cylindrical anode is inserted into the discharge chamber to enhance the plasma discharge. The plasma parameters and density profile are measured by an electrostatic Langmuir probe at different magnetic fields and anode voltages. The RF power absorption by the plasma can be effectively enhanced by the external magnetic field compared with the nonmagnetized discharge. The plasma density can be further increased by the application of a voltage to the assistant anode. Owing to the effective power absorption and enhanced plasma discharge by the assistant anode in a longitudinal magnetic field, the plasma density can be enhanced by more than a factor of two. Meanwhile, the nonuniformity of the plasma density is less than 10% and it can be achieved in a process chamber with a diameter of 600 mm

  18. Chemical analysis of plasma-assisted antimicrobial treatment on cotton

    International Nuclear Information System (INIS)

    Kan, C W; Lam, Y L; Yuen, C W M; Luximon, A; Lau, K W; Chen, K S

    2013-01-01

    This paper explores the use of plasma treatment as a pretreatment process to assist the application of antimicrobial process on cotton fabric with good functional effect. In this paper, antimicrobial finishing agent, Microfresh Liquid Formulation 9200-200 (MF), and a binder (polyurethane dispersion, Microban Liquid Formulation R10800-0, MB) will be used for treating the cotton fabric for improving the antimicrobial property and pre-treatment of cotton fabric by plasma under atmospheric pressure will be employed to improve loading of chemical agents. The chemical analysis of the treated cotton fabric will be conducted by Fourier transform Infrared Spectroscopy.

  19. Nonlinear electrostatic ion cyclotron waves in an rf-plugged inhomogeneous plasma slab

    International Nuclear Information System (INIS)

    Ikemura, Tsutomu.

    1977-01-01

    A theory based on the fluid and perturbation theories is developed to analytically study a nonlinear electrostatic ion cyclotron wave excited in an rf-plugged inhomogeneous plasma slab by applying a pair of external potentials phi sub(ext)(x,z) = +-PHI 0 cos ω 0 t.exp(-z 2 /2h 2 ) at its boundaries x = +-L. Here, B 0 is applied along the z-axis. The potential forms of the fundamental and the nonlinear second harmonic are found as functions of x, z and t provided the field-free densities vary as exp(-x 2 /2d 2 )(d 2 /h 2 0 ) created by the fundamental potential can approximately be regarded as a dipole field, provided that /1-μ/ 0 2 -ω sub(cl)sup(2))m sub(i)d 2 /(γ sub(i)T sub(i)+Z γ sub(e)T sub(e)). Under the stricter condition μ asymptotically equals 1, a dipole-like electric field can also be excited in the entire region for the case of high density and weak nonlinearity. It is shown that the assumption ω 0 -1 √ γ sub(e)T sub(e)/m sub(e) can lead to the Boltzmann relation for the electron fluid even in inhomogeneous plasmas. Moreover, the density depletion delta N sub(i) obtained here contains a new considerable term proportional to /phi/ 2 , in addition to the usual term proportional to -/delta phi/delta x/ 2 which originates from the ponderomotive force. (auth.)

  20. Plasma cleaning of ITER first mirrors

    Science.gov (United States)

    Moser, L.; Marot, L.; Steiner, R.; Reichle, R.; Leipold, F.; Vorpahl, C.; Le Guern, F.; Walach, U.; Alberti, S.; Furno, I.; Yan, R.; Peng, J.; Ben Yaala, M.; Meyer, E.

    2017-12-01

    Nuclear fusion is an extremely attractive option for future generations to compete with the strong increase in energy consumption. Proper control of the fusion plasma is mandatory to reach the ambitious objectives set while preserving the machine’s integrity, which requests a large number of plasma diagnostic systems. Due to the large neutron flux expected in the International Thermonuclear Experimental Reactor (ITER), regular windows or fibre optics are unusable and were replaced by so-called metallic first mirrors (FMs) embedded in the neutron shielding, forming an optical labyrinth. Materials eroded from the first wall reactor through physical or chemical sputtering will migrate and will be deposited onto mirrors. Mirrors subject to net deposition will suffer from reflectivity losses due to the deposition of impurities. Cleaning systems of metallic FMs are required in more than 20 optical diagnostic systems in ITER. Plasma cleaning using radio frequency (RF) generated plasmas is currently being considered the most promising in situ cleaning technique. An update of recent results obtained with this technique will be presented. These include the demonstration of cleaning of several deposit types (beryllium, tungsten and beryllium proxy, i.e. aluminium) at 13.56 or 60 MHz as well as large scale cleaning (mirror size: 200 × 300 mm2). Tests under a strong magnetic field up to 3.5 T in laboratory and first experiments of RF plasma cleaning in EAST tokamak will also be discussed. A specific focus will be given on repetitive cleaning experiments performed on several FM material candidates.

  1. Designing of RF ion source and the power sources system

    International Nuclear Information System (INIS)

    Rusdiyanto.

    1978-01-01

    An RF ion source prototype is being developed for the particle accelerator at the Gama Research Centre. Supply of the gas is fed into the plasma chamber by means of neadle valve system. Magnetic field strength of about 500 gauss is applied to the system to improve the ionization efficiency. Components and spare parts of the RF ion source are made based on locally available materials and are discussed in this report. (author)

  2. Improving bondability to RTV silicone elastomer using rf-activated gas

    International Nuclear Information System (INIS)

    Bellah, J.L.

    1979-05-01

    The effects of an rf-activated gas (plasma) on the bondability to RTV silicone elastomer were studied. Processing guidelines were developed, and a method was sought to satisfactorily bond RTV to the walls of a machined aluminum casting and to provide a surface on the RTV which would best accept bonding to an epoxy encapsulant. Processing parameters, such as gas type and flow rate, reaction chamber pressure, and rf power level, were developed

  3. Realization of thermally durable close-packed 2D gold nanoparticle arrays using self-assembly and plasma etching

    International Nuclear Information System (INIS)

    Sivaraman, Sankar K; Santhanam, Venugopal

    2012-01-01

    Realization of thermally and chemically durable, ordered gold nanostructures using bottom-up self-assembly techniques are essential for applications in a wide range of areas including catalysis, energy generation, and sensing. Herein, we describe a modular process for realizing uniform arrays of gold nanoparticles, with interparticle spacings of 2 nm and above, by using RF plasma etching to remove ligands from self-assembled arrays of ligand-coated gold nanoparticles. Both nanoscale imaging and macroscale spectroscopic characterization techniques were used to determine the optimal conditions for plasma etching, namely RF power, operating pressure, duration of treatment, and type of gas. We then studied the effect of nanoparticle size, interparticle spacing, and type of substrate on the thermal durability of plasma-treated and untreated nanoparticle arrays. Plasma-treated arrays showed enhanced chemical and thermal durability, on account of the removal of ligands. To illustrate the application potential of the developed process, robust SERS (surface-enhanced Raman scattering) substrates were formed using plasma-treated arrays of silver-coated gold nanoparticles that had a silicon wafer or photopaper as the underlying support. The measured value of the average SERS enhancement factor (2 × 10 5 ) was quantitatively reproducible on both silicon and paper substrates. The silicon substrates gave quantitatively reproducible results even after thermal annealing. The paper-based SERS substrate was also used to swab and detect probe molecules deposited on a solid surface. (paper)

  4. Plasma Turbulence Suppression and Transport Barrier Formation by Externally Driven RF Waves in Spherical Tokamaks

    International Nuclear Information System (INIS)

    Bruma, C.; Cuperman, S.C.; Komoshvili, K.

    2002-01-01

    Turbulent transport of heat and particles is the principle obstacle confronting controlled fusion today. Thus, we investigate quantitatively the suppression of turbulence and formation of transport barriers in spherical tokamaks by sheared electric fields generated by externally driven radio-frequency (RF) waves, in the frequency range o)A n o] < o)ci (e)A and o)ci are the Alfven and ion cyclotron frequencies). This investigation consists of the solution of the full-wave equation for a spherical tokamak in the presence of externally driven fast waves and the evaluation of the power dissipation by the mode-converted Alfven waves. This in turn, provides a radial flow shear responsible for the suppression of plasma turbulence. Thus, a strongly non-linear equation for the radial sheared electric field is solved, the turbulent transport suppression rate is evaluated and compared with the ion temperature gradient (ITG) instability increment. For illustration, the case of START-like device (Sykes 2000) is treated. Thus, (i) the exact D-shape cross-section is considered; (ii) additional kinetic (including Landau damping) and particle trapping effects are added to the resistive two-fluid dielectric tensor operator; (iii) a finite extension antenna located on the low-field-side of the plasma is considered; (iv) a rigorous 2.5 finite elements numerical code (Sewell 1993) is used; and (v) the turbulence and transport barrier generated as a result of wave-plasma interaction is evaluated

  5. Incorporation of low energy activated nitrogen onto HOPG surface: Chemical states and thermal stability studies by in-situ XPS and Raman spectroscopy

    Science.gov (United States)

    Chandran, Maneesh; Shasha, Michal; Michaelson, Shaul; Hoffman, Alon

    2016-09-01

    In this paper we report the chemical states analysis of activated nitrogen incorporated highly oriented pyrolytic graphite (HOPG) surface under well-controlled conditions. Nitrogen incorporation is carried out by two different processes: an indirect RF nitrogen plasma and low energy (1 keV) N2+ implantation. Bonding configuration, concentration and thermal stability of the incorporated nitrogen species by aforesaid processes are systematically compared by in-situ X-ray photoelectron spectroscopy (XPS). Relatively large concentration of nitrogen is incorporated onto RF nitride HOPG surface (16.2 at.%), compared to N2+ implanted HOPG surface (7.7 at.%). The evolution of N 1s components (N1, N2, N3) with annealing temperature is comprehensively discussed, which indicates that the formation and reorganization of local chemical bonding states are determined by the process of nitridation and not by the prior chemical conditioning (i.e., amorphization or hydrogenation) of the HOPG surface. A combined XPS and Raman spectroscopy studies revealed that N2+ implantation process resulted in a high level of defects to the HOPG surface, which cannot be annealed-out by heat treatment up to 1000 °C. On the other hand, the RF nitrogen plasma process did not produce a high level of surface defects, while incorporating nearly the same amount of stable nitrogen species.

  6. Improving the work function of the niobium surface of SRF cavities by plasma processing

    Science.gov (United States)

    Tyagi, P. V.; Doleans, M.; Hannah, B.; Afanador, R.; McMahan, C.; Stewart, S.; Mammosser, J.; Howell, M.; Saunders, J.; Degraff, B.; Kim, S.-H.

    2016-04-01

    An in situ plasma processing technique using chemically reactive oxygen plasma to remove hydrocarbons from superconducting radio frequency cavity surfaces at room temperature has been developed at the spallation neutron source, at Oak Ridge National Laboratory. To understand better the interaction between the plasma and niobium surface, surface studies on small samples were performed. In this article, we report the results from those surface studies. The results show that plasma processing removes hydrocarbons from top surface and improves the surface work function by 0.5-1.0 eV. Improving the work function of RF surface of cavities can help to improve their operational performance.

  7. Time-resolved resonance fluorescence spectroscopy for study of chemical reactions in laser-induced plasmas.

    Science.gov (United States)

    Liu, Lei; Deng, Leimin; Fan, Lisha; Huang, Xi; Lu, Yao; Shen, Xiaokang; Jiang, Lan; Silvain, Jean-François; Lu, Yongfeng

    2017-10-30

    Identification of chemical intermediates and study of chemical reaction pathways and mechanisms in laser-induced plasmas are important for laser-ablated applications. Laser-induced breakdown spectroscopy (LIBS), as a promising spectroscopic technique, is efficient for elemental analyses but can only provide limited information about chemical products in laser-induced plasmas. In this work, time-resolved resonance fluorescence spectroscopy was studied as a promising tool for the study of chemical reactions in laser-induced plasmas. Resonance fluorescence excitation of diatomic aluminum monoxide (AlO) and triatomic dialuminum monoxide (Al 2 O) was used to identify these chemical intermediates. Time-resolved fluorescence spectra of AlO and Al 2 O were used to observe the temporal evolution in laser-induced Al plasmas and to study their formation in the Al-O 2 chemistry in air.

  8. A new extremum seeking technique and its application to maximize RF heating on FTU

    International Nuclear Information System (INIS)

    Carnevale, D.; Astolfi, A.; Centioli, C.; Podda, S.; Vitale, V.; Zaccarian, L.

    2009-01-01

    We propose a new global extremum seeking algorithm to optimize the coupling between the emitting Lower Hybrid (LH) antennas and the plasma scrape off layer in the radiofrequency (RF) heating problem in tokamak plasmas. The new algorithm, where the existing disturbances affecting the system are seen as the probing signals, requires less constraining properties than the previous ones and is more robust. In particular, simulation results are presented illustrating the effectiveness of the algorithm on the Lower Hybrid RF heating of the Frascati Tokamak Upgrade (FTU).

  9. Applying chemical engineering concepts to non-thermal plasma reactors

    Science.gov (United States)

    Pedro AFFONSO, NOBREGA; Alain, GAUNAND; Vandad, ROHANI; François, CAUNEAU; Laurent, FULCHERI

    2018-06-01

    Process scale-up remains a considerable challenge for environmental applications of non-thermal plasmas. Undersanding the impact of reactor hydrodynamics in the performance of the process is a key step to overcome this challenge. In this work, we apply chemical engineering concepts to analyse the impact that different non-thermal plasma reactor configurations and regimes, such as laminar or plug flow, may have on the reactor performance. We do this in the particular context of the removal of pollutants by non-thermal plasmas, for which a simplified model is available. We generalise this model to different reactor configurations and, under certain hypotheses, we show that a reactor in the laminar regime may have a behaviour significantly different from one in the plug flow regime, often assumed in the non-thermal plasma literature. On the other hand, we show that a packed-bed reactor behaves very similarly to one in the plug flow regime. Beyond those results, the reader will find in this work a quick introduction to chemical reaction engineering concepts.

  10. The TORE SUPRA fast reciprocating RF probe

    International Nuclear Information System (INIS)

    Thomas, C.E. Jr.; Harris, J.H.; Haste, G.R.

    1994-01-01

    A fast reciprocating ICRF (Ion Cyclotron Range of Frequencies) probe was installed and operated on TORE SUPRA during 1992/1993. The body of the probe was originally used on the ATF experiment at ORNL. The probe was adapted for use on TORE SUPRA, and mounted on one of the two fast reciprocating probe mounts. The probe consists of two orthogonal single-turn wire loops, mounted so that one loop senses toroidal RF magnetic fields and the other senses poloidal RF magnetic fields. The probe began operation in June, 1993. The probe active area is approximately 5 cm long by 2 cm, and the reciprocating mount has a slow stroke (5 cm/sec) of 30 cm by 2 cm, and the reciprocating mount has a slow stroke (5 cm/sec) of 30 cm and a fast stroke (1.5 m/sec) of about 10 cm. The probe was operated at distances from the plasma edge ranging from 30 cm to -5 cm (i.e., inside the last closed flux surface). The probe design, electronics, calibration, data acquisition and data processing are discussed. First data from the probe are presented as a function of ICRF power, distance from the plasma, loop orientation, and other plasma parameters. Initial data shows parametric instabilities do not play an important role for ICRF in the TORE SUPRA edge and scrape-off-layer (SOL) plasmas. Additionally it is observed that the probe signal has little or no dependence on position in the SOL/plasma edge

  11. Resonant power absorption in helicon plasma sources

    International Nuclear Information System (INIS)

    Chen Guangye; Arefiev, Alexey V.; Bengtson, Roger D.; Breizman, Boris N.; Lee, Charles A.; Raja, Laxminarayan L.

    2006-01-01

    Helicon discharges produce plasmas with a density gradient across the confining magnetic field. Such plasmas can create a radial potential well for nonaxisymmetric whistlers, allowing radially localized helicon (RLH) waves. This work presents new evidence that RLH waves play a significant role in helicon plasma sources. An experimentally measured plasma density profile in an argon helicon discharge is used to calculate the rf field structure. The calculations are performed using a two-dimensional field solver under the assumption that the density profile is axisymmetric. It is found that RLH waves with an azimuthal wave number m=1 form a standing wave structure in the axial direction and that the frequency of the RLH eigenmode is close to the driving frequency of the rf antenna. The calculated resonant power absorption, associated with the RLH eigenmode, accounts for most of the rf power deposited into the plasma in the experiment

  12. Self-consistent modeling of radio-frequency plasma generation in stellarators

    Energy Technology Data Exchange (ETDEWEB)

    Moiseenko, V. E., E-mail: moiseenk@ipp.kharkov.ua; Stadnik, Yu. S., E-mail: stadnikys@kipt.kharkov.ua [National Academy of Sciences of Ukraine, National Science Center Kharkov Institute of Physics and Technology (Ukraine); Lysoivan, A. I., E-mail: a.lyssoivan@fz-juelich.de [Royal Military Academy, EURATOM-Belgian State Association, Laboratory for Plasma Physics (Belgium); Korovin, V. B. [National Academy of Sciences of Ukraine, National Science Center Kharkov Institute of Physics and Technology (Ukraine)

    2013-11-15

    A self-consistent model of radio-frequency (RF) plasma generation in stellarators in the ion cyclotron frequency range is described. The model includes equations for the particle and energy balance and boundary conditions for Maxwell’s equations. The equation of charged particle balance takes into account the influx of particles due to ionization and their loss via diffusion and convection. The equation of electron energy balance takes into account the RF heating power source, as well as energy losses due to the excitation and electron-impact ionization of gas atoms, energy exchange via Coulomb collisions, and plasma heat conduction. The deposited RF power is calculated by solving the boundary problem for Maxwell’s equations. When describing the dissipation of the energy of the RF field, collisional absorption and Landau damping are taken into account. At each time step, Maxwell’s equations are solved for the current profiles of the plasma density and plasma temperature. The calculations are performed for a cylindrical plasma. The plasma is assumed to be axisymmetric and homogeneous along the plasma column. The system of balance equations is solved using the Crank-Nicholson scheme. Maxwell’s equations are solved in a one-dimensional approximation by using the Fourier transformation along the azimuthal and longitudinal coordinates. Results of simulations of RF plasma generation in the Uragan-2M stellarator by using a frame antenna operating at frequencies lower than the ion cyclotron frequency are presented. The calculations show that the slow wave generated by the antenna is efficiently absorbed at the periphery of the plasma column, due to which only a small fraction of the input power reaches the confinement region. As a result, the temperature on the axis of the plasma column remains low, whereas at the periphery it is substantially higher. This leads to strong absorption of the RF field at the periphery via the Landau mechanism.

  13. Fundamental limits on gas-phase chemical reduction of NOx in a plasma

    Energy Technology Data Exchange (ETDEWEB)

    Penetrante, B.M.; Hsiao, M.C.; Merritt, B.T.; Vogtlin, G.E. [Lawrence Livermore National Lab., CA (United States)

    1997-12-31

    In the plasma, the electrons do not react directly with the NOx molecules. The electrons collide mainly with the background gas molecules like N{sub 2}, O{sub 2} and H{sub 2}O. Electron impact on these molecules result partly in dissociation reactions that produce reactive species like N, O and OH. The NOx in the engine exhaust gas initially consist mostly of NO. The ground state nitrogen atom, N, is the only species that could lead to the chemical reduction of NO to N{sub 2}. The O radical oxidizes NO to NO{sub 2} leaving the same amount of NOx. The OH radical converts NO{sub 2} to nitric acid. Acid products in the plasma can easily get adsorbed on surfaces in the plasma reactor and in the pipes. When undetected, the absence of these oxidation products can often be mistaken for chemical reduction of NOx. In this paper the authors will examine the gas-phase chemical reduction of NOx. They will show that under the best conditions, the plasma can chemically reduce 1.6 grams of NOx per brake-horsepower-hour [g(NOx)/bhp-hr] when 5% of the engine output energy is delivered to the plasma.

  14. Improvement of Plating Characteristics Between Nickel and PEEK by Plasma Treatment and Chemical Etching

    International Nuclear Information System (INIS)

    Lee, Hye W.; Lee, Jong K.; Park, Ki Y.

    2009-01-01

    Surface of PEEK(poly-ether-ether-ketone) was modified by chemical etching, plasma treatment and mechanical grinding to improve the plating adhesion. The plating characteristics of these samples were studied by the contact angle, plating thickness, gloss and adhesion. Chemical etching and plasma treatment increased wettability, adhesion and gloss. The contact angle of as-received PEEK was 61 .deg. . The contact angles of chemical etched, plasma treated or both were improved to the range of 15∼33 .deg. . In the case of electroless plating, the thickest layer without blister was 1.6 μm. The adhesion strengths by chemical etching, plasma treatment or both chemical etching and plasma treatment were 75 kgf/cm 2 , 102 kgf/cm 2 , 113 kgf/cm 2 , respectively, comparing to the 24 kgf/cm 2 of as-received. In the case of mechanically ground PEEKs, the adhesion strengths were higher than those unground, with the sacrifice of surface gloss. The gloss of untreated PEEK were greater than mechanically ground PEEKs. Plating thickness increased linearly with the plating times

  15. Structure and gas-barrier properties of amorphous hydrogenated carbon films deposited on inner walls of cylindrical polyethylene terephthalate by plasma-enhanced chemical vapor deposition

    International Nuclear Information System (INIS)

    Li Jing; Gong Chunzhi; Tian Xiubo; Yang Shiqin; Fu, Ricky K.Y.; Chu, Paul K.

    2009-01-01

    The influence of radio-frequency (RF) power on the structure and gas permeation through amorphous hydrogenated carbon films deposited on cylindrical polyethylene terephthalate (PET) samples is investigated. The results show that a higher radio-frequency power leads to a smaller sp 3 /sp 2 value but produces fewer defects with smaller size. The permeability of PET samples decreases significantly after a-C:H deposition and the RF only exerts a small influence. However, the coating uniformity, color, and wettability of the surface are affected by the RF power. A higher RF power results in to better uniformity and it may be attributed to the combination of the high-density plasma and sample heating.

  16. Thin TiO2 films deposited by implantation and sputtering in RF inductively coupled plasmas

    International Nuclear Information System (INIS)

    Valencia-Alvarado, R; López-Callejas, R; Barocio, S R; Mercado-Cabrera, A; Peña-Eguiluz, R; Muñoz-Castro, A E; Rodríguez-Méndez, B G; De la Piedad-Beneitez, A; De la Rosa-Vázquez, J M

    2012-01-01

    The achievement of titanium dioxide (TiO 2 ) thin films in the rutile crystalline phase is reported. The samples result from the implantation of oxygen ions of Ti in argon/oxygen plasma generated by inductively coupled RF at a commercial 13.56 MHz frequency. Simultaneously, a sputtering process is conducted on the titanium target in order to produce TiO 2 thin films in the anatase phase over silicon and glass substrates. Both implantation and sputtering processes shared the same 500 W plasma with the target, polarized between 0 and -3 kV. The substrates were placed between 2 and 3 cm from the target, this distance being found to be determinant of the TiO 2 deposition rate. The rutile phase in the target was obtained at temperatures in the order of 680 degrees C and the anatase (unbiased) one at about 300 degrees C without any auxiliary heating. The crystalline phases were characterized by x ray diffraction and Raman spectroscopy. The morphology and average roughness were established by means of scanning electronic and atomic force microscopy, whereas the reaction products generated during the oxidation process were analyzed by mass spectrometry. Finally, the stoichiometric composition was measured by means of X-ray photoelectron spectroscopy.

  17. Etching of UO2 in NF3 RF Plasma Glow Discharge

    Energy Technology Data Exchange (ETDEWEB)

    Veilleux, John M. [Univ. of California, Berkeley, CA (United States)

    1999-08-01

    A series of room temperature, low pressure (10.8 to 40 Pa), low power (25 to 210 W) RF plasma glow discharge experiments with UO2 were conducted to demonstrate that plasma treatment is a viable method for decontaminating UO2 from stainless steel substrates. Experiments were conducted using NF3 gas to decontaminate depleted uranium dioxide from stainless-steel substrates. Depleted UO2 samples each containing 129.4 Bq were prepared from 100 microliter solutions of uranyl nitrate hexahydrate solution. The amorphous UO2 in the samples had a relatively low density of 4.8 gm/cm3. Counting of the depleted UO2 on the substrate following plasma immersion was performed using liquid scintillation counting with alpha/beta discrimination due to the presence of confounding beta emitting daughter products, 234Th and 234Pa. The alpha emission peak from each sample was integrated using a gaussian and first order polynomial fit to improve quantification. The uncertainties in the experimental measurement of the etched material were estimated at about ± 2%. Results demonstrated that UO2 can be completely removed from stainless-steel substrates after several minutes processing at under 200 W. At 180 W and 32.7 Pa gas pressure, over 99% of all UO2 in the samples was removed in just 17 minutes. The initial etch rate in the experiments ranged from 0.2 to 7.4 μm/min. Etching increased with the plasma absorbed power and feed gas pressure in the range of 10.8 to 40 Pa. A different pressure effect on UO2 etching was also noted below 50 W in which etching increased up to a maximum pressure, ~23 Pa, then decreased with further increases in pressure.

  18. Pressurized rf cavities in ionizing beams

    Directory of Open Access Journals (Sweden)

    B. Freemire

    2016-06-01

    Full Text Available A muon collider or Higgs factory requires significant reduction of the six dimensional emittance of the beam prior to acceleration. One method to accomplish this involves building a cooling channel using high pressure gas filled radio frequency cavities. The performance of such a cavity when subjected to an intense particle beam must be investigated before this technology can be validated. To this end, a high pressure gas filled radio frequency (rf test cell was built and placed in a 400 MeV beam line from the Fermilab linac to study the plasma evolution and its effect on the cavity. Hydrogen, deuterium, helium and nitrogen gases were studied. Additionally, sulfur hexafluoride and dry air were used as dopants to aid in the removal of plasma electrons. Measurements were made using a variety of beam intensities, gas pressures, dopant concentrations, and cavity rf electric fields, both with and without a 3 T external solenoidal magnetic field. Energy dissipation per electron-ion pair, electron-ion recombination rates, ion-ion recombination rates, and electron attachment times to SF_{6} and O_{2} were measured.

  19. Structural, optical and electrical peculiarities of r.f. plasma sputtered indium tin oxide films

    International Nuclear Information System (INIS)

    Boycheva, Sylvia; Sytchkova, Anna Krasilnikova; Grilli, Maria Luisa; Piegari, Angela

    2007-01-01

    In this work the influence of the deposition conditions on the structural, electrical and optical properties of the ITO films was studied. Films were deposited by r.f. plasma sputtering technique in Ar and varying Ar + O 2 gas mixtures, with and without substrate heating. Transmittance and reflectance of the films were measured in the range 350-2500 nm; the refractive index (n) and the extinction coefficient (k) were calculated by the spectral data simulation. The sheet resistance of the films was measured by four-point probe method. X-ray diffraction analysis was performed to study the texture of the films. Threshold behaviour was observed in the optical and electrical properties of ITO films deposited in Ar + O 2 atmosphere at a certain oxygen concentration determined by a fix combination of all other deposition conditions. A schematic diagram for the change of the film properties versus composition was suggested, which explains the obtained results

  20. Review of tearing mode stabilization by RF power in tokamaks

    International Nuclear Information System (INIS)

    Giruzzi, G.; Zabiego, M.; Zohm, H.

    1999-01-01

    Control of tearing modes by means of heating and current drive inside the magnetic islands is one of the most important applications of RF power in tokamak reactors. The theoretical basis of this concept is reviewed, focusing on aspects related to RF-plasma interaction. Applications to the stabilization of neoclassical tearing modes in ITER by Electron Cyclotron Current Drive are presented to illustrate the basic physical dependences. The most significant experimental results and prospects for future applications are also discussed

  1. Influence Of Intensive Exercise On Renal Functions (Rf And Advanced Glycation End-Products (Ages

    Directory of Open Access Journals (Sweden)

    Miroslav Mydlík

    2012-06-01

    In conclusion, RF abnormalities in runners were caused by dehydration, protein catabolism, rhabdomyolysis and others. These RF changes were not present or parameters not significantly differed from initial values 2 days after both runs. Plasma AGEs and AOPPs in runners were in reference ranges, no significant changes during the both runs were observed.

  2. Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition

    CERN Document Server

    Kim, H

    2002-01-01

    We have investigated the growth kinetics of plasma-enhanced Ti atomic layer deposition (ALD) using a quartz crystal microbalance. Ti ALD films were grown at temperatures from 20 to 200 deg. C using TiCl sub 4 as a source gas and rf plasma-produced atomic H as the reducing agent. Postdeposition ex situ chemical analyses of thin films showed that the main impurity is oxygen, mostly incorporated during the air exposure prior to analysis. The thickness per cycle, corresponding to the growth rate, was measured by quartz crystal microbalance as a function of various key growth parameters, including TiCl sub 4 and H exposure time, rf plasma power, and sample temperature. The growth rates were independent of TiCl sub 4 exposure above 1x10 sup 3 L, indicating typical ALD mode growth. The key kinetic parameters for Cl extraction reaction and TiCl sub 4 adsorption kinetics were obtained and the growth kinetics were modeled to predict the growth rates based upon these results. Also, the dependency of growth kinetics on d...

  3. Deposition of nanostructured fluorocarbon plasma polymer films by RF magnetron sputtering of polytetrafluoroethylene

    Energy Technology Data Exchange (ETDEWEB)

    Kylian, Ondrej, E-mail: ondrej.kylian@gmail.com; Drabik, Martin; Polonskyi, Oleksandr; Cechvala, Juraj; Artemenko, Anna; Gordeev, Ivan; Choukourov, Andrei; Matolinova, Iva; Slavinska, Danka; Biederman, Hynek, E-mail: bieder@kmf.troja.mff.cuni.cz

    2011-07-29

    The RF magnetron sputtering of polytetrafluoroethylene target is studied with the aim to find out conditions leading to the deposition of super-hydrophobic thin films. It is shown that such coatings can be prepared at elevated pressures and a longer distance between the sputtered target and the substrate. This is explained by an increase in the density of longer C{sub x}F{sub y} molecules that reach the substrate and a lower flux of ions and CF{sub 2} radicals on the surface of growing film under such deposition conditions, as observed by optical emission spectroscopy and mass spectrometry. Such changes in plasma composition result in a deposition of rough films having F/C ratio close to 2 as observed by scanning electron microscopy and X-ray photoelectron spectroscopy, respectively. These findings clearly distinguish our results from the previous investigations of polytetrafluoroethylene sputtering performed at shorter distances from the target, where either low F/C ratio or low roughness of the deposited films did not allow reaching super-hydrophobic character of the coatings.

  4. Surface Modification of Polymeric Materials by Plasma Treatment

    Directory of Open Access Journals (Sweden)

    E.F. Castro Vidaurre

    2002-03-01

    Full Text Available Low-temperature plasma treatment has been used in the last years as a useful tool to modify the surface properties of different materials, in special of polymers. In the present work low temperature plasma was used to treat the surface of asymmetric porous substrates of polysulfone (PSf membranes. The main purpose of this work was to study the influence of the exposure time and the power supplied to argon plasma on the permeability properties of the membranes. Three rf power levels, respectively 5, 10 and 15 W were used. Treatment time ranged from 1 to 50 min. Reduction of single gas permeability was observed with Ar plasma treatments at low energy bombardment (5 W and short exposure time (20 min. Higher power and/or higher plasma exposition time causes a degradation process begins. The chemical and structural characterization of the membranes before and after the surface modification was done by AFM, SEM and XPS.

  5. Profiles of plasma parameters and density of negative hydrogen ions by laser detachment measurements in RF-driven ion sources; Profile der Plasmaparameter und Dichte negativer Wasserstoffionen mittels Laserdetachmentmessungen in HF-angeregten Ionenquellen

    Energy Technology Data Exchange (ETDEWEB)

    Christ-Koch, Sina

    2007-12-20

    This work shows the application of the Laserdetachment method for spatially resolved measurements of negative Hydrogen/Deuterium ion density. It was applied on a high power low pressure RF-driven ion source. The Laser detachment method is based on the measurement of electron currents on a positively biased Langmuir probe before and during/after a laser pulse. The density ratio of negative ions to electrons can be derived from the ratio of currents to the probe. The absolute density of negative ions can be obtained when the electron density is measured with the standard Langmuir probe setup. Measurements with the Langmuir probe additionally yield information about the floating and plasma potential, the electron temperature and the density of positive ions. The Laser detachment setup had to be adapted to the special conditions of the RF-driven source. In particular the existence of RF fields (1 MHz), high source potential (-20 kV), magnetic fields ({proportional_to} 7 mT) and caesium inside the source had to be considered. The density of negative ions could be identified in the range of n(H{sup -})=1.10{sup 17} 1/m{sup 3}, which is in the same order of magnitude as the electron density. Only the application of the Laser detachment method with the Langmuir probe measurements will yield spatially resolved plasma parameters and H- density profiles. The influence of diverse external parameters, such as pressure, RF-power, magnetic fields on the plasma parameters and their profiles were studied and explained. Hence, the measurements lead to a detailed understanding of the processes inside the source. (orig.)

  6. Chemical derivatization to enhance chemical/oxidative stability of resorcinol-formaldehyde resin

    Energy Technology Data Exchange (ETDEWEB)

    Hubler, T.L. [Pacific Northwest National Lab., Richland, WA (United States)

    1997-10-01

    The goal of this task is to develop modified resorcinol-formaldehyde (R-F) resin to improve the chemical/oxidative stability of the resin. R-F resin is a regenerable organic ion-exchange resin that is selective for cesium ion in highly alkaline, high ionic-strength solutions. R-F resin tends to undergo chemical degradation, reducing its ability to remove cesium ion from waste solutions; the mechanistic details of these decomposition reactions are currently unknown. The approach used for this task is chemical modification of the resin structure, particularly the resorcinol ring unit of the polymer resin. This approach is based on prior characterization studies conducted at Pacific Northwest National Laboratory (PNNL) that indicated the facile chemical degradation of the resin is oxidation of the resorcinol ring to the para-quinone structure, with subsequent loss of ion-exchange sites for cesium ion. R-F resin represents an important alternative to current radiocesium remediation technology for tank wastes at both the Hanford and Savannah River sites, particularly if regenerable resins are needed.

  7. Research on Permeability of Poly(ethylene) Terephthalate Track Membranes Modified in Plasma

    CERN Document Server

    Dmitriev, S N; Sleptsov, V V; Elinson, V M; Potrjasaj, V V

    2001-01-01

    The properties of poly(ethylene) terephthalate track membranes subjected to the plasma RF-discharge treatment in air have been investigated. The effect of the treatment conditions in plasma on the structure and the properties of the membranes formed in the gas-discharge etching has been studied. It has been figured out that the influence of the air plasma on the membranes under study leads to a formation of asymmetric membranes with a higher flow rate, the structure and chemical composition of their superficial layer are changed. It is shown that the presence of the modified layer on the surface of the membranes causes changing their hydrodynamic characteristics - water permeability of the membranes treated in plasma in a greater degree depends upon {pH} of the filtered solution.

  8. Photoluminescence from PP-HMDSO thin films deposited using a remote plasma of 13.56 MHz hollow cathode discharge

    International Nuclear Information System (INIS)

    Naddaf, M; Saloum, S; Hamadeh, H

    2007-01-01

    Room temperature photoluminescence (PL) from plasma-polymerized hexamethyldisiloxane (PP-HMDSO) thin films deposited on silicon wafers has been investigated as a function of both the applied RF power and the monomer flow rate. Films were deposited in a low pressure-low temperature remote plasma ignited in a 13.56 MHz hollow cathode discharge reactor, using pure HMDSO as a monomer and Ar as a feed gas. The substrate temperature during the deposition was as low as 40 deg. C and the total pressure was about 0.03 mbar. Optical emission spectroscopy (OES) has been used as in situ tool for monitoring the different chemical species present in the plasma during deposition processes. The deposited PP-HMDSO films showed a strong, broad 'green/yellow' PL band. The RF power and the flow rate of the HMDSO monomer are found to have a significant impact on the PL intensity of the deposited film. The changes in the chemical bonding of the film as a function of deposition parameters have been investigated by using the Fourier transform infrared (FTIR) spectroscopic analysis and are related to PL and OES results. The 'green/yellow' PL band is ascribed to chemical groups and bonds of silicon, hydrogen and/or oxygen constituting the films, in particular, SiH, SiO bonds and silanol Si-O-H groups

  9. Photoluminescence from PP-HMDSO thin films deposited using a remote plasma of 13.56 MHz hollow cathode discharge

    Science.gov (United States)

    Naddaf, M.; Saloum, S.; Hamadeh, H.

    2007-07-01

    Room temperature photoluminescence (PL) from plasma-polymerized hexamethyldisiloxane (PP-HMDSO) thin films deposited on silicon wafers has been investigated as a function of both the applied RF power and the monomer flow rate. Films were deposited in a low pressure-low temperature remote plasma ignited in a 13.56 MHz hollow cathode discharge reactor, using pure HMDSO as a monomer and Ar as a feed gas. The substrate temperature during the deposition was as low as 40 °C and the total pressure was about 0.03 mbar. Optical emission spectroscopy (OES) has been used as in situ tool for monitoring the different chemical species present in the plasma during deposition processes. The deposited PP-HMDSO films showed a strong, broad 'green/yellow' PL band. The RF power and the flow rate of the HMDSO monomer are found to have a significant impact on the PL intensity of the deposited film. The changes in the chemical bonding of the film as a function of deposition parameters have been investigated by using the Fourier transform infrared (FTIR) spectroscopic analysis and are related to PL and OES results. The 'green/yellow' PL band is ascribed to chemical groups and bonds of silicon, hydrogen and/or oxygen constituting the films, in particular, SiH, SiO bonds and silanol Si-O-H groups.

  10. Photoluminescence from PP-HMDSO thin films deposited using a remote plasma of 13.56 MHz hollow cathode discharge

    Energy Technology Data Exchange (ETDEWEB)

    Naddaf, M; Saloum, S; Hamadeh, H [Department of Physics, Atomic Energy Commission of Syria (AECS), PO Box 6091, Damascus (Syrian Arab Republic)

    2007-07-07

    Room temperature photoluminescence (PL) from plasma-polymerized hexamethyldisiloxane (PP-HMDSO) thin films deposited on silicon wafers has been investigated as a function of both the applied RF power and the monomer flow rate. Films were deposited in a low pressure-low temperature remote plasma ignited in a 13.56 MHz hollow cathode discharge reactor, using pure HMDSO as a monomer and Ar as a feed gas. The substrate temperature during the deposition was as low as 40 deg. C and the total pressure was about 0.03 mbar. Optical emission spectroscopy (OES) has been used as in situ tool for monitoring the different chemical species present in the plasma during deposition processes. The deposited PP-HMDSO films showed a strong, broad 'green/yellow' PL band. The RF power and the flow rate of the HMDSO monomer are found to have a significant impact on the PL intensity of the deposited film. The changes in the chemical bonding of the film as a function of deposition parameters have been investigated by using the Fourier transform infrared (FTIR) spectroscopic analysis and are related to PL and OES results. The 'green/yellow' PL band is ascribed to chemical groups and bonds of silicon, hydrogen and/or oxygen constituting the films, in particular, SiH, SiO bonds and silanol Si-O-H groups.

  11. Photoluminescence from PP-HMDSO thin films deposited using a remote plasma of 13.56 MHz hollow cathode discharge

    International Nuclear Information System (INIS)

    Naddaf, M.; Saloum, S.; Hamadeh, H.

    2008-01-01

    Room temperature photoluminescence (PL) from plasma-polymerized hexamethyldisiloxane (PP-HMDSO) thin films deposited on silicon wafers has been investigated as a function of both the applied RF power and the monomer flow rate. Films were deposited in a low pressure-low temperature remote plasma ignited in a 13.56 MHz hollow cathode discharge reactor, using pure HMDSO as a monomer and Ar as a feed gas. The substrate temperature during the deposition was as low as 40 deg. C and the total pressure was about 0.03 mbar. Optical emission spectroscopy (OES) has been used as in situ tool for monitoring the different chemical species present in the plasma during deposition processes. The deposited PP-HMDSO films showed a strong, broad 'green/yellow' PL band. The RF power and the flow rate of the HMDSO monomer are found to have a significant impact on the PL intensity of the deposited film. The changes in the chemical bonding of the film as a function of deposition parameters have been investigated by using the Fourier transform infrared (FTIR) spectroscopic analysis and are related to PL and OES results. The 'green/yellow' PL band is ascribed to chemical groups and bonds of silicon, hydrogen and/or oxygen constituting the films, in particular, SiH, SiO bonds and silanol Si-O-H groups. (Authors)

  12. Simultaneous in situ measurements of properties of particulates in rf silane plasmas using a polarization-sensitive laser-light-scattering method

    Science.gov (United States)

    Shiratani, Masaharu; Kawasaki, Hiroharu; Fukuzawa, Tsuyoshi; Yoshioka, Takashi; Ueda, Yoshio; Singh, Sanjay; Watanabe, Yukio

    1996-01-01

    A polarization-sensitive laser-light-scattering method is developed for simultaneous in situ measurements of properties (size, size dispersion, density, and refractive index) of particulates formed in processing plasmas. The developed system is applied to observe the growth processes of particulates in a range of their size larger than about 10 nm in rf silane plasmas. A size, a size dispersion (logarithm of a standard deviation of size), a density, and a refractive index of particulates in the plasmas are found to be 10-200 nm, about 0.1, 107-109 cm-3 and about 3-5i, respectively. The former three of such values agree fairly well with ones deduced from scanning electron microscopic (SEM) observation. These particulates grow through three phases of nucleation and initial growth, rapid growth, and growth saturation. Coexistence of two size groups of particulates with narrow size dispersions during and after the rapid growth phase verified by the SEM observation may be explained by a model taking into account coagulation between oppositely charged particulates.

  13. Time-Domain Simulation of RF Couplers

    International Nuclear Information System (INIS)

    Smithe, David; Carlsson, Johan; Austin, Travis

    2009-01-01

    We have developed a finite-difference time-domain (FDTD) fluid-like approach to integrated plasma-and-coupler simulation [1], and show how it can be used to model LH and ICRF couplers in the MST and larger tokamaks.[2] This approach permits very accurate 3-D representation of coupler geometry, and easily includes non-axi-symmetry in vessel wall, magnetic equilibrium, and plasma density. The plasma is integrated with the FDTD Maxwell solver in an implicit solve that steps over electron time-scales, and permits tenuous plasma in the coupler itself, without any need to distinguish or interface between different regions of vacuum and/or plasma. The FDTD algorithm is also generalized to incorporate a time-domain sheath potential [3] on metal structures within the simulation, to look for situations where the sheath potential might generate local sputtering opportunities. Benchmarking of the time-domain sheath algorithm has been reported in the references. Finally, the time-domain software [4] permits the use of particles, either as field diagnostic (test particles) or to self-consistently compute plasma current from the applied RF power.

  14. Design of a helicon plasma source for ion–ion plasma production

    Energy Technology Data Exchange (ETDEWEB)

    Sharma, N., E-mail: narayan.sharma@cppipr.res.in; Chakraborty, M.; Neog, N.K.; Bandyopadhyay, M.

    2017-04-15

    Highlights: • Development of a helicon plasma system to carry out ion–ion plasma studies in electronegative gases such as Hydrogen, Oxygen and Chlorine. • Determination of initial parameters of helicon plasma source for ion–ion plasma by using dispersion relation of bounded helicon waves. • Design and development of solenoid with magnetic field strength production capability of ∼ 600 G along the axis of the chamber. • Optimization of the chamber parameters using Helic codes and estimation of optimum attainable density. • Estimation of RF power requirements for various gases. - Abstract: A helicon plasma system is being designed and developed at CPP-IPR. The design parameters of the system are deduced from the dispersion relation of bounded helicon waves and the required magnetic fields are simulated by using Poisson Superfish code. The Helic code is used to simulate the power deposition profile for various conditions and to investigate the optimum values of chamber parameters for effective coupling of radio frequency (RF) power to plasma. The helicon source system is aimed at carrying out ion–ion plasma studies in electronegative gases such as Hydrogen, Oxygen and Chlorine. The system mainly consists of a source chamber in which helicon plasma will be produced by injecting RF power at a frequency of 13.56 MHz through a right helical antenna in presence of a DC magnetic field followed by an expansion chamber in which it is expected to produce negative ions along with the positive ions. Installation of the various parts of the system is in progress. The details of the design and development of the system is presented in this article.

  15. Nanoparticle manipulation in the near-substrate areas of low-temperature, high-density rf plasmas

    International Nuclear Information System (INIS)

    Rutkevych, P.P.; Ostrikov, K.; Xu, S.

    2005-01-01

    Manipulation of a single nanoparticle in the near-substrate areas of high-density plasmas of low-temperature glow discharges is studied. It is shown that the nanoparticles can be efficiently manipulated by the thermophoretic force controlled by external heating of the substrate stage. Particle deposition onto or repulsion from nanostructured carbon surfaces critically depends on the values of the neutral gas temperature gradient in the near-substrate areas, which is directly measured in situ in different heating regimes by originally developed temperature gradient probe. The measured values of the near-surface temperature gradient are used in the numerical model of nanoparticle dynamics in a variable-length presheath. Specific conditions enabling the nanoparticle to overcome the repulsive potential and deposit on the substrate during the discharge operation are investigated. The results are relevant to fabrication of various nanostructured films employing structural incorporation of the plasma-grown nanoparticles, in particular, to nanoparticle deposition in the plasma-enhanced chemical-vapor deposition of carbon nanostructures in hydrocarbon-based plasmas

  16. Effect of antenna capacitance on the plasma characteristics of an internal linear inductively coupled plasma system

    International Nuclear Information System (INIS)

    Lim, Jong Hyeuk; Kim, Kyong Nam; Park, Jung Kyun; Yeom, Geun Young

    2008-01-01

    This study examined the effect of the antenna capacitance of an inductively coupled plasma (ICP) source, which was varied using an internal linear antenna, on the electrical and plasma characteristics of the ICP source. The inductive coupling at a given rf current increased with decreasing antenna capacitance. This was caused by a decrease in the inner copper diameter of the antenna made from coaxial copper/quartz tubing, which resulted in a higher plasma density and lower plasma potential. By decreasing the diameter of the copper tube from 25 to 10 mm, the plasma density of a plasma source size of 2750x2350 mm 2 was increased from approximately 8x10 10 /cm 3 to 1.5x10 11 /cm 3 at 15 mTorr Ar and 9 kW of rf power

  17. Oxygen Barrier Coating Deposited by Novel Plasma-enhanced Chemical Vapor Deposition

    DEFF Research Database (Denmark)

    Jiang, Juan; Benter, M.; Taboryski, Rafael Jozef

    2010-01-01

    We report the use of a novel plasma-enhanced chemical vapor deposition chamber with coaxial electrode geometry for the SiOx deposition. This novel plasma setup exploits the diffusion of electrons through the inner most electrode to the interior samples space as the major energy source. This confi......We report the use of a novel plasma-enhanced chemical vapor deposition chamber with coaxial electrode geometry for the SiOx deposition. This novel plasma setup exploits the diffusion of electrons through the inner most electrode to the interior samples space as the major energy source...... effect of single-layer coatings deposited under different reaction conditions was studied. The coating thickness and the carbon content in the coatings were found to be the critical parameters for the barrier property. The novel barrier coating was applied on different polymeric materials...

  18. Informing the Human Plasma Protein Binding of ...

    Science.gov (United States)

    The free fraction of a xenobiotic in plasma (Fub) is an important determinant of chemical adsorption, distribution, metabolism, elimination, and toxicity, yet experimental plasma protein binding data is scarce for environmentally relevant chemicals. The presented work explores the merit of utilizing available pharmaceutical data to predict Fub for environmentally relevant chemicals via machine learning techniques. Quantitative structure-activity relationship (QSAR) models were constructed with k nearest neighbors (kNN), support vector machines (SVM), and random forest (RF) machine learning algorithms from a training set of 1045 pharmaceuticals. The models were then evaluated with independent test sets of pharmaceuticals (200 compounds) and environmentally relevant ToxCast chemicals (406 total, in two groups of 238 and 168 compounds). The selection of a minimal feature set of 10-15 2D molecular descriptors allowed for both informative feature interpretation and practical applicability domain assessment via a bounded box of descriptor ranges and principal component analysis. The diverse pharmaceutical and environmental chemical sets exhibit similarities in terms of chemical space (99-82% overlap), as well as comparable bias and variance in constructed learning curves. All the models exhibit significant predictability with mean absolute errors (MAE) in the range of 0.10-0.18 Fub. The models performed best for highly bound chemicals (MAE 0.07-0.12), neutrals (MAE 0

  19. The Synergistic Effect between Electrical and Chemical Factors in Plasma Gene/Molecule-Transfection

    Science.gov (United States)

    Jinno, Masafumi

    2016-09-01

    This study has been done to know what kind of factors in plasma and processes on cells promote plasma gene/molecule transfection. We have discovered a new plasma source using a microcapillary electrode which enables high transfection efficiency and high cell survivability simultaneously. However, the mechanism of the transfection by plasma was not clear. To clarify the transfection mechanisms by micro plasma, we focused on the effects of electrical (current, charge, field, etc.) and chemical (radicals, RONS, etc.) factors generated by the micro plasma and evaluated the contribution weight of three groups of the effects and processes, i.e. electrical, chemical and biochemical ones. At first, the necessity of the electrical factors was estimated by the laser produced plasma (LPP). Mouse L-929 fibroblast cell was cultured on a 96-well plate or 12-well micro slide chamber. Plasmids pCX-EGFP in Tris-EDTA buffer was dropped on the cells and they were exposed to the capillary discharge plasma (CDP) or the LPP. In the case of the CDP, the plasma was generated between the tip of the capillary electrode and the cells so that both electrical and chemical factors were supplied to the cells. In this setup, about 20% of average transfection efficiency was obtained. In the case of the LPP, the plasma was generated apart from the cells so that electrical factors were not supplied to the cells. In this setup, no transfection was observed. These results show that the electrical factors are necessary for the plasma gene transfection. Next, the necessity of the chemical factors was estimated the effect of catalase to remove H2O2 in CDP. The transfection efficiency decreased to 0.4 by scavenging H2O2 with catalase. However, only the solution of H2O2 caused no gene transfection in cells. These results shows that H2O2 is important species to cause gene/molecule transfection but still needs a synergistic effect with electrical or other chemical factors. This work was partly supported by

  20. Synthesis, structural characterization, and performance evaluation of resorcinol-formaldehyde (R-F) ion-exchange resin

    International Nuclear Information System (INIS)

    Hubler, T.L.; Franz, J.A.; Shaw, W.J.; Bryan, S.A.; Hallen, R.T.; Brown, G.N.; Bray, L.A.; Linehan, J.C.

    1995-08-01

    The 177 underground storage tanks at the DOE's Hanford Site contain an estimated 180 million tons of high-level radioactive wastes. It is desirable to remove and concentrate the highly radioactive fraction of the tank wastes for vitrification. Resorcinol-formaldehyde (R-F) resin, an organic ion-exchange resin with high selectivity and capacity for the cesium ion, which is a candidate ion-exchange material for use in remediation of tank wastes. The report includes information on the structure/function analysis of R-F resin and the synthetic factors that affect performance of the resin. CS-100, a commercially available phenol-formaldehyde (P-F) resin, and currently the baseline ion-exchanger for removal of cesium ion at Hanford, is compared with the R-F resin. The primary structural unit of the R-F resin was determined to consist of a 1,2,3,4-tetrasubstituted resorcinol ring unit while CS-100, was composed mainly of a 1,2,4-trisubstituted ring. CS-100 shows the presence of phenoxy-ether groups, and this may account for the much lower decontamination factor of CS-100 for cesium ion. Curing temperatures for the R-F resin were found to be optimal at 105--130C. At lower temperatures, insufficient curing, hence crosslinking, of the polymer resin occurs and selectivity for cesium drops. Curing at elevated temperatures leads to chemical degradation. Optimal particle size for R-F resin is in the range of 20--50 mesh-sized particles. R-F resin undergoes chemical degradation or oxidation which destroys ion-exchange sites. The ion-exchange sites (hydroxyl groups) are converted to quinones and ketones. CS-100, though it has much lower performance for cesium ion-exchange, is significantly more chemically stable than R-F resin. To gamma radiation, CS-100 is more radiolytically stable than R-F resin

  1. Synthesis, structural characterization, and performance evaluation of resorcinol-formaldehyde (R-F) ion-exchange resin

    Energy Technology Data Exchange (ETDEWEB)

    Hubler, T.L.; Franz, J.A.; Shaw, W.J.; Bryan, S.A.; Hallen, R.T.; Brown, G.N.; Bray, L.A.; Linehan, J.C.

    1995-08-01

    The 177 underground storage tanks at the DOE`s Hanford Site contain an estimated 180 million tons of high-level radioactive wastes. It is desirable to remove and concentrate the highly radioactive fraction of the tank wastes for vitrification. Resorcinol-formaldehyde (R-F) resin, an organic ion-exchange resin with high selectivity and capacity for the cesium ion, which is a candidate ion-exchange material for use in remediation of tank wastes. The report includes information on the structure/function analysis of R-F resin and the synthetic factors that affect performance of the resin. CS-100, a commercially available phenol-formaldehyde (P-F) resin, and currently the baseline ion-exchanger for removal of cesium ion at Hanford, is compared with the R-F resin. The primary structural unit of the R-F resin was determined to consist of a 1,2,3,4-tetrasubstituted resorcinol ring unit while CS-100, was composed mainly of a 1,2,4-trisubstituted ring. CS-100 shows the presence of phenoxy-ether groups, and this may account for the much lower decontamination factor of CS-100 for cesium ion. Curing temperatures for the R-F resin were found to be optimal at 105--130C. At lower temperatures, insufficient curing, hence crosslinking, of the polymer resin occurs and selectivity for cesium drops. Curing at elevated temperatures leads to chemical degradation. Optimal particle size for R-F resin is in the range of 20--50 mesh-sized particles. R-F resin undergoes chemical degradation or oxidation which destroys ion-exchange sites. The ion-exchange sites (hydroxyl groups) are converted to quinones and ketones. CS-100, though it has much lower performance for cesium ion-exchange, is significantly more chemically stable than R-F resin. To gamma radiation, CS-100 is more radiolytically stable than R-F resin.

  2. PumpKin: A tool to find principal pathways in plasma chemical models

    Science.gov (United States)

    Markosyan, A. H.; Luque, A.; Gordillo-Vázquez, F. J.; Ebert, U.

    2014-10-01

    PumpKin is a software package to find all principal pathways, i.e. the dominant reaction sequences, in chemical reaction systems. Although many tools are available to integrate numerically arbitrarily complex chemical reaction systems, few tools exist in order to analyze the results and interpret them in relatively simple terms. In particular, due to the large disparity in the lifetimes of the interacting components, it is often useful to group reactions into pathways that recycle the fastest species. This allows a researcher to focus on the slow chemical dynamics, eliminating the shortest timescales. Based on the algorithm described by Lehmann (2004), PumpKin automates the process of finding such pathways, allowing the user to analyze complex kinetics and to understand the consumption and production of a certain species of interest. We designed PumpKin with an emphasis on plasma chemical systems but it can also be applied to atmospheric modeling and to industrial applications such as plasma medicine and plasma-assisted combustion.

  3. Development of nanocrystalline Indium Tin Oxide (ITO) thin films using RF-magnetron sputtering

    International Nuclear Information System (INIS)

    Tamilselvan, N.; Thilakan, Periyasamy

    2013-01-01

    ITO thin films have been deposited on glass substrate using RF Magnetron puttering Technique from the pre-synthesized ITO target. The sputtering parameters such as the deposition temperature, gas composition and the RF power densities were varied. X-ray diffraction studies revealed that the crystallization of the films is mostly depending on the RF power density and substrate temperature. Crystallized films exhibited a change in the preferred orientation from (111) plane to (100) plane at specific conditions such as high RF power density and high oxygen mixing to the plasma. Change in the film microstructure and a shift in the optical bandgap were recorded from the SEM and UV-Visible measurements respectively. (author)

  4. Improving plasma resistance and lowering roughness in an ArF photoresist by adding a chemical reaction inhibitor

    International Nuclear Information System (INIS)

    Jinnai, Butsurin; Uesugi, Takuji; Koyama, Koji; Samukawa, Seiji; Kato, Keisuke; Yasuda, Atsushi; Maeda, Shinichi; Momose, Hikaru

    2010-01-01

    Major challenges associated with 193 nm lithography using an ArF photoresist are low plasma resistance and roughness formation in the ArF photoresist during plasma processes. We have previously found decisive factors affecting the plasma resistance and roughness formation in an ArF photoresist: plasma resistance is determined by UV/VUV radiation, and roughness formation is dominated by chemical reactions. In this study, based on our findings on the interaction between plasma radiation species and ArF photoresist polymers, we proposed an ArF photoresist with a chemical reaction inhibitor, which can trap reactive species from the plasma, and characterized the performances of the resultant ArF photoresist through neutral beam experiments. Hindered amine light stabilizers, i.e. 4-hydroxy-2,2,6,6-tetramethyl-1-piperidinyloxy (HO-TEMPO), were used as the chemical reaction inhibitor. Etching rates of the ArF photoresist films were not dependent on the HO-TEMPO content in the irradiations without chemical reactions or under UV/VUV radiation. However, in the irradiation with chemical reactions, the etching rates of the ArF photoresist films decreased as the HO-TEMPO content increased. In addition, the surface roughness decreased with the increase in the additive amount of chemical reaction inhibitor. According to FTIR analysis, a chemical reaction inhibitor can inhibit the chemical reactions in ArF photoresist films through plasma radicals. These results indicate that a chemical reaction inhibitor is effective against chemical reactions, resulting in improved plasma resistance and less roughness in an ArF photoresist. These results also support our suggested mechanism of plasma resistance and roughness formation in an ArF photoresist.

  5. Post-CMP cleaning for metallic contaminant removal by using a remote plasma and UV/ozone

    International Nuclear Information System (INIS)

    Lim, Jong Min; Jeon, Bu Yong; Lee, Chong Mu

    2000-01-01

    For the chemical mechanical polishing (CMP) process to be successful, it is important to establish a good post-CMP cleaning process that will remove not only slurry and particles but also metallic impurities from the polished surface. The common metallic contaminants found after oxide CMP and Cu CMP include Cu, K, and Fe. Scrubbing, a popular method for post-CMP cleaning, is effective in removing particles, but removal of metallic contaminants using this method is not so effective. In this study, the removal of Fe metallic contaminants like Fe, which are commonly found on the wafer surface after CMP processes, was investigated using remote-hydrogen-plasma and UV/O 3 cleaning techniques. Our results show that metal contaminants, including Fe, can be effectively removed by using a hydrogen-plasma or UV/O 3 cleaning technique performed under optimal process conditions. In remote plasma H 2 cleaning, contaminant removal is enhanced with decreasing plasma exposure time and increasing rf-power. The optimal process condition for the removal of the Fe impurities existing on the wafer surface is an rf-power of 100 W. Plasma cleaning for 5 min or less is effective in removing Fe contaminants, but a plasma exposure time of 1 min is more appropriate than 5 min in view of the process time, The surface roughness decreased by 30∼50 % after remote-H 2 -plasma cleaning. On the other hand, the highest efficiency of Fe-impurity removal was achieved for an UV exposure time of 30 s. The removal mechanism for the Fe contaminants in the remote-H 2 -plasma and the UV/O 3 cleaning processes is considered to be the liftoff of Fe atoms when the SiO is removed by evaporation after the chemical or native SiO 2 formed underneath the metal atoms reacts with H + and e - to form SiO

  6. SISAK liquid-liquid extraction experiments with preseparated 257Rf

    International Nuclear Information System (INIS)

    Omtvedt, Jon Petter; Alstad, J.; Breivik, H.; Dyve, J.E.; Eberhardt, K.; Folden III, C.M.; Ginter, T.; Gregorich, K.E.; Hult, E.A.; Johansson, M.; Kirbach, U.W.; Lee, D.M.; Mendel, M.; Nahler, A.; Ninov, V.; Omtvedt, L.A.; Patin, J.B.; Skarnemark, G.; Stavsetra, L.; Sudowe, R.; Wiehl, N.; Wierczinski, B.; Wilk, P.A.; Zielinski, P.M.; Kratz, J.V.; Trautmann, N.; Nitsche, H.; Hoffman, D.C.

    2002-01-01

    The SISAK liquid-liquid extraction system was used to extract 4.0-s 257Rf. The 257Rf was produced in the reaction 208Pb(50Ti, 1n)257Rf with 237-MeV beam energy on target, separated in the Berkeley Gas-filled Separator (BGS) and transferred to a gas jet using the Recoil Transfer Chamber (RTC). The activity delivered by the gas jet was dissolved in 6-M HNO3 and Rf was extracted into 0.25-M dibutyl-phosphoric acid in toluene. This was the first time a transactinide, i.e., an element with Z >= 104, was extracted and unequivocally identified by the SISAK system. Thus, this pilot experiment demonstrates that the fast liquid-liquid extraction system SISAK, in combination with liquidscintillation detectors, can be used for investigating the chemical properties of the transactinides. The extraction result is in accordance with the behaviour shown by the Rf group IV homologues Zr and Hf

  7. Design of power supply system for the prototype RF-driven negative ion source for neutral beam injection application

    Energy Technology Data Exchange (ETDEWEB)

    Jiang, Caichao; Hu, Chundong [Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031 (China); Graduate school, University of Science and Technology of China, Hefei 230026 (China); Wei, Jianglong, E-mail: jlwei@ipp.ac.cn [Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031 (China); Xie, Yahong; Xu, Yongjian; Liang, Lizhen; Chen, Shiyong; Liu, Sheng; Liu, Zhimin; Xie, Yuanlai [Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031 (China)

    2017-04-15

    Highlights: • A supporting power supply system was designed in details for a RF-driven prototype negative ion source at ASIPP. • The RF power supply for plasma generation adopts an all-solid-state power supply structure. • The extraction grid power supply adopts the pulse step modulator (PSM) technology. - Abstract: In order to study the generation and extraction of negative ions for neutral beam injection application, a prototype RF-driven negative ion source and the corresponding test bed are under construction at Institute of Plasma Physics, Chinese Academy of Sciences (ASIPP). The target of the negative ion source is extracting a negation ion beam of 350 A/m{sup 2} for 3600 s plasma duration and 100 s beam duration. According to the required parameters of test bed, the design of power supply system is put forward for earlier study. In this paper, the performance requirements and design schemes of RF power supply for plasma generation, impedance matching network, bias voltage power supply, and extraction voltage power supply for negative beam extraction are introduced in details. The schemes provide a reference for the construction of power supply system and lay a foundation for the next phase of experimental operation.

  8. Chemical analysis of refractories by plasma spectrometry

    International Nuclear Information System (INIS)

    Coutinho, C.A.

    1990-01-01

    X-ray spectrometry has been, since the last two or three decades, the traditional procedure for the chemical analysis of refractories, due to its high degree of accuracy and speed to produce analytical results. An interesting alternative to X-ray fluorescence is provided by the Inductively Coupled Plasma Spectrometry technique, for those laboratories where wet chemistry facilities are already available or process control is not required at high speed, or investiment costs have to be low. This paper presents results obtained by plasma spectroscopy for the analysis of silico - aluminous refractories, showing calibration curves, precion and detection limits. Considerations and comparisons with X-ray fluorescence are also made. (author) [pt

  9. Dynamic behavior of detached recombining plasmas during ELM-like plasma heat pulses in the divertor plasma simulator NAGDIS-II

    International Nuclear Information System (INIS)

    Uesugi, Y.; Hattori, N.; Nishijima, D.; Ohno, N.; Takamura, S.

    2001-01-01

    It has been recognized that the ELMs associated with a good confinement at the edge, such as H-mode, must bring an enormous energy to the divertor target plate through SOL and detached plasmas. The understanding of the ELM energy transport through SOL to the divertor target is rather poor at the moment, which leads to an ambiguous estimation of the deposited heat load on the divertor target in ITER. In the present work the ELM-like plasma heat pulse is generated by rf heating in a linear divertor plasma simulator. Energetic electrons with an energy range 10-40 eV are effectively generated by rf heating in low temperature plasmas with (T e )< ∼1 eV. It is observed experimentally that the energetic electrons ionize the highly excited Rydberg atoms quickly, bringing a rapid increase of the ion particle flux to the target, and make the detached plasmas attached to the target. Detailed physical processes about the interaction between the heat pulse with conduction and convection, and detached recombining plasmas are discussed

  10. Study of electron current extraction from a radio frequency plasma cathode designed as a neutralizer for ion source applications

    Energy Technology Data Exchange (ETDEWEB)

    Jahanbakhsh, Sina, E-mail: sinajahanbakhsh@gmail.com; Satir, Mert; Celik, Murat [Department of Mechanical Engineering, Bogazici University, Istanbul 34342 (Turkey)

    2016-02-15

    Plasma cathodes are insert free devices that are developed to be employed as electron sources in electric propulsion and ion source applications as practical alternatives to more commonly used hollow cathodes. Inductively coupled plasma cathodes, or Radio Frequency (RF) plasma cathodes, are introduced in recent years. Because of its compact geometry, and simple and efficient plasma generation, RF plasma source is considered to be suitable for plasma cathode applications. In this study, numerous RF plasma cathodes have been designed and manufactured. Experimental measurements have been conducted to study the effects of geometric and operational parameters. Experimental results of this study show that the plasma generation and electron extraction characteristics of the RF plasma cathode device strongly depend on the geometric parameters such as chamber diameter, chamber length, orifice diameter, orifice length, as well as the operational parameters such as RF power and gas mass flow rate.

  11. Research on water permeability of poly(ethylene) terephthalate track membranes modified with plasma

    International Nuclear Information System (INIS)

    Kravets, L.I.; Dmitriev, S.N.; Sleptsov, V.V.; Elinson, V.M.; Potryasay, V.V.

    2001-01-01

    The properties of poly(ethylene) terephthalate track membranes subjected to effect of plasma of the RF-discharge in air have been investigated. The influence conditions of a plasma treatment on the surface properties and hydrodynamic characteristics of the membranes has been studied. It has been found that the effect of the air plasma on the researched membranes results in a formation of asymmetric track membranes with a higher flow rate, the structure and chemical composition of their superficial layer are changed. It was shown that the availability of the modified layer on the membrane surface caused changing in their hydrodynamic characteristics - the water permeability of the membranes, processed in plasma, in a greater degree depends upon pH of a filtered solution. (author)

  12. A solid-state nuclear magnetic resonance study of post-plasma reactions in organosilicone microwave plasma-enhanced chemical vapor deposition (PECVD) coatings.

    Science.gov (United States)

    Hall, Colin J; Ponnusamy, Thirunavukkarasu; Murphy, Peter J; Lindberg, Mats; Antzutkin, Oleg N; Griesser, Hans J

    2014-06-11

    Plasma-polymerized organosilicone coatings can be used to impart abrasion resistance and barrier properties to plastic substrates such as polycarbonate. Coating rates suitable for industrial-scale deposition, up to 100 nm/s, can be achieved through the use of microwave plasma-enhanced chemical vapor deposition (PECVD), with optimal process vapors such as tetramethyldisiloxane (TMDSO) and oxygen. However, it has been found that under certain deposition conditions, such coatings are subject to post-plasma changes; crazing or cracking can occur anytime from days to months after deposition. To understand the cause of the crazing and its dependence on processing plasma parameters, the effects of post-plasma reactions on the chemical bonding structure of coatings deposited with varying TMDSO-to-O2 ratios was studied with (29)Si and (13)C solid-state magic angle spinning nuclear magnetic resonance (MAS NMR) using both single-pulse and cross-polarization techniques. The coatings showed complex chemical compositions significantly altered from the parent monomer. (29)Si MAS NMR spectra revealed four main groups of resonance lines, which correspond to four siloxane moieties (i.e., mono (M), di (D), tri (T), and quaternary (Q)) and how they are bound to oxygen. Quantitative measurements showed that the ratio of TMDSO to oxygen could shift the chemical structure of the coating from 39% to 55% in Q-type bonds and from 28% to 16% for D-type bonds. Post-plasma reactions were found to produce changes in relative intensities of (29)Si resonance lines. The NMR data were complemented by Fourier transform infrared (FTIR) spectroscopy. Together, these techniques have shown that the bonding environment of Si is drastically altered by varying the TMDSO-to-O2 ratio during PECVD, and that post-plasma reactions increase the cross-link density of the silicon-oxygen network. It appears that Si-H and Si-OH chemical groups are the most susceptible to post-plasma reactions. Coatings produced at a

  13. Toxicity challenges in environmental chemicals: Prediction of ...

    Science.gov (United States)

    Physiologically based pharmacokinetic (PBPK) models bridge the gap between in vitro assays and in vivo effects by accounting for the adsorption, distribution, metabolism, and excretion of xenobiotics, which is especially useful in the assessment of human toxicity. Quantitative structure-activity relationships (QSAR) serve as a vital tool for the high-throughput prediction of chemical-specific PBPK parameters, such as the fraction of a chemical unbound by plasma protein (Fub). The presented work explores the merit of utilizing experimental pharmaceutical Fub data for the construction of a universal QSAR model, in order to compensate for the limited range of high-quality experimental Fub data for environmentally relevant chemicals, such as pollutants, pesticides, and consumer products. Independent QSAR models were constructed with three machine-learning algorithms, k nearest neighbors (kNN), random forest (RF), and support vector machine (SVM) regression, from a large pharmaceutical training set (~1000) and assessed with independent test sets of pharmaceuticals (~200) and environmentally relevant chemicals in the ToxCast program (~400). Small descriptor sets yielded the optimal balance of model complexity and performance, providing insight into the biochemical factors of plasma protein binding, while preventing over fitting to the training set. Overlaps in chemical space between pharmaceutical and environmental compounds were considered through applicability of do

  14. Fungicidal Effects of Plasma and Radio-Wave Pre-treatments on Seeds of Grain Crops and Legumes

    Science.gov (United States)

    Filatova, Irina; Azharonok, Viktor; Shik, Alexander; Antoniuk, Alexandra; Terletskaya, Natalia

    An influence of RF plasma and RF electromagnetic field pre-treatments on level of fungal infection of some important agricultural plants has been studied. It is shown that pre-sowing plasma and radio-wave seeds treatments contribute to their germination enhancement and plant productivity improvement owing to stimulative and fungicidal effect of plasma and RF electromagnetic field irradiation.

  15. Photoemission starting of induction rf-driven multicusp ion sources

    International Nuclear Information System (INIS)

    Pickard, D.S.; Leung, K.N.; Perkins, L.T.; Ponce, D.M.; Young, A.T.

    1996-01-01

    It has been demonstrated that pulsed and continuous wave, rf-driven hydrogen discharges can be started with photoemission. The extracted H - current from a photoemission-started plasma has been investigated and does not differ significantly from that of a filament-started plasma. The minimum pressure for photoemissive starting was found to be higher than that of filament starting, 17 mTorr compared to 7 mTorr, respectively, in this particular configuration. copyright 1996 American Institute of Physics

  16. Atomic force microscopy indentation of fluorocarbon thin films fabricated by plasma enhanced chemical deposition at low radio frequency power

    International Nuclear Information System (INIS)

    Sirghi, L.; Ruiz, A.; Colpo, P.; Rossi, F.

    2009-01-01

    Atomic force microscopy (AFM) indentation technique is used for characterization of mechanical properties of fluorocarbon (CF x ) thin films obtained from C 4 F 8 gas by plasma enhanced chemical vapour deposition at low r.f. power (5-30 W) and d.c. bias potential (10-80 V). This particular deposition method renders films with good hydrophobic property and high plastic compliance. Commercially available AFM probes with stiff cantilevers (10-20 N/m) and silicon sharpened tips (tip radius < 10 nm) are used for indentations and imaging of the resulted indentation imprints. Force depth curves and imprint characteristics are used for determination of film hardness, elasticity modulus and plasticity index. The measurements show that the decrease of the discharge power results in deposition of films with decreased hardness and stiffness and increased plasticity index. Nanolithography based on AFM indentation is demonstrated on thin films (thickness of 40 nm) with good plastic compliance.

  17. Application of plasma shield technology to the reduction, treatment, and disposal of hazardous organic and/or mixed wastes with actinide recovery

    International Nuclear Information System (INIS)

    Adams, B.T.; Vaughan, L.L.; Joyce, E.L. Jr.; Bieniewski, T.M.

    1990-01-01

    Los Alamos research activities are currently directed at the application of the shielded hydrogen plasma torch to the direct production of actinide metals from a UF 6 feedstock. Two broad classes of thermal plasma reactors are currently in widespread use: the direct current (dc) arc jet system and the radio frequency (rf) inductively coupled system. Los Alamos has improved upon the basic rf plasma tube design using the concept of a transformer. The unique feature of the Los Alamos tube is a segmented, cooled, internal radiation shield. The Los Alamos shielded plasma torch routinely achieves temperatures exceeding 10,000 K and electron densities of 10 16 /cm 3 when operated continuously at one atmosphere of argon. These highly energetic conditions are sufficient to dissociate most chemical compounds into their constituent atoms. Based upon these characteristics, Los Alamos is currently investigating the application of the shielded plasma torch technology to the destruction of organic and mixed hazardous wastes, as well as the direct production of actinide metals from the halides and oxides, without the cogeneration of contaminated wastes. 5 refs., 4 figs

  18. Discharge physics and chemistry of a novel atmospheric pressure plasma source

    Energy Technology Data Exchange (ETDEWEB)

    Park, J.; Henins, I.; Hermann, J.W.; Selwyn, G.S.; Jeong, J.Y.; Hickis, R.

    1999-07-01

    The atmospheric pressure plasma jet (APPJ) is a unique plasma source operating at atmospheric pressure. The APPJ operates with RF power and produces a stable non-thermal discharge in capacitively-coupled configuration. The discharge is spatially and temporally homogeneous and provides a unique gas phase chemistry that is well suited for various applications including etching, film deposition, surface treatment and decontamination of chemical and biological warfare (CBW) agents. A theoretical model shows electron densities of 0.2--2 x 10{sup 11} cm{sup {minus}3} for a helium discharge at a power level of 3--30 W cm{sup {minus}3}. The APPJ also produces a large flux, equivalent of up to 10,000 monolayer s{sup {minus}1}, of chemically-active, atomic and metastable molecular species which can impinge surfaces several cm downstream of the confined source. In addition, the efforts are in progress to measure the electron density using microwave diagnostics and to benchmark the gas phase chemical model by using LIF and titration.

  19. Numerical simulation of electromagnetic fields and impedance of CERN LINAC4 H(-) source taking into account the effect of the plasma.

    Science.gov (United States)

    Grudiev, A; Lettry, J; Mattei, S; Paoluzzi, M; Scrivens, R

    2014-02-01

    Numerical simulation of the CERN LINAC4 H(-) source 2 MHz RF system has been performed taking into account a realistic geometry from 3D Computer Aided Design model using commercial FEM high frequency simulation code. The effect of the plasma has been added to the model by the approximation of a homogenous electrically conducting medium. Electric and magnetic fields, RF power losses, and impedance of the circuit have been calculated for different values of the plasma conductivity. Three different regimes have been found depending on the plasma conductivity: (1) Zero or low plasma conductivity results in RF electric field induced by the RF antenna being mainly capacitive and has axial direction; (2) Intermediate conductivity results in the expulsion of capacitive electric field from plasma and the RF power coupling, which is increasing linearly with the plasma conductivity, is mainly dominated by the inductive azimuthal electric field; (3) High conductivity results in the shielding of both the electric and magnetic fields from plasma due to the skin effect, which reduces RF power coupling to plasma. From these simulations and measurements of the RF power coupling on the CERN source, a value of the plasma conductivity has been derived. It agrees well with an analytical estimate calculated from the measured plasma parameters. In addition, the simulated and measured impedances with and without plasma show very good agreement as well demonstrating validity of the plasma model used in the RF simulations.

  20. ICRF plasma production in Tore Supra: analysis of antenna coupling and plasma properties

    International Nuclear Information System (INIS)

    Beaumont, B.; Becoulet, A.; Lyssoivan, A.

    1999-01-01

    A study of RF plasma production frequency range ω. 2ω ci has been undertaken on Tore Supra taking into account antenna coupling predictions of theory and the TEXTOR-94 database. Two scenarios for RF discharges have been tested (fixed frequency of the RF generator): operation with pure toroidal magnetic field, at standard and lower B T and operation in the magnetic configuration with a small vertical (B V ) field superimposed on B T (B V T ). (authors)

  1. The experience with JET's combined dc/Rf glow discharge cleaning (GDC) system

    International Nuclear Information System (INIS)

    Pearce, R.J.H.; Andrew, P.; Bryan, S.

    1996-01-01

    The JET Tokamak was fitted with four new electrodes of novel design, each powered from individual computer controlled dc and RF supplies. Details of enhancements and problems from 15 months experience with the system are outlined. Experiments were performed to assess the effect of RF on the glow discharge characteristics, and to establish stable glow at low pressure and high voltage. JET combined RF/dc glow discharge cleaning (GDC) had no significant advantages over pure dc GDC, provided highly stable dc current control was obtained. In fact, the mechanically weak electrode inductor spiral required to allow RF posed a distinct disadvantage. The electrodes were converted to simple plates, following damage caused by halo currents during Tokamak plasma disruptions. The performance of these electrodes was assessed. Future developments in the JET GDC system are outlined. (Author)

  2. Multi-step capacitor discharges as an RF generator

    International Nuclear Information System (INIS)

    Hotta, Eiki; Yamamoto, Shunji; Ishii, Shozo; Hayashi, Izumi

    1979-01-01

    A variety of methods have been developed for large output radio frequency (RF) generators to heat and stabilize high temperature plasma. As the generators for this purpose, capacitor discharge, cable discharge, and oscillation with electronic tubes are considered. Here, a new RF generator is reported, which utilizes capacitor discharge to extract heavy current, and solves the difficulty of short duration by employing multistep discharges. The authors solved the problem of frequency decrease in capacitor discharge by cutting off the unnecessary capacitors reasonably from the load circuit, using the additional circuit for shunting current and vacuum gap switches. The vacuum gap switches and the trigger system are described together with the RF generator manufactured. The generator was fabricated to be rather compact for its large output and simple in circuitry as compared with conventional oscillator systems. The shortcomings are frequency variation and the improper phase of switching the next step in to cause instability, when the load change occurs. It would be difficult to operate the generator in a RF range of more than about 10 MHz due to jitter of the vacuum gap switches and others. (Wakatsuki, Y.)

  3. A new hybrid scheme for simulations of highly collisional RF-driven plasmas

    International Nuclear Information System (INIS)

    Eremin, Denis; Hemke, Torben; Mussenbrock, Thomas

    2016-01-01

    This work describes a new 1D hybrid approach for modeling atmospheric pressure discharges featuring complex chemistry. In this approach electrons are described fully kinetically using particle-in-cell/Monte-Carlo (PIC/MCC) scheme, whereas the heavy species are modeled within a fluid description. Validity of the popular drift-diffusion approximation is verified against a ‘full’ fluid model accounting for the ion inertia and a fully kinetic PIC/MCC code for ions as well as electrons. The fluid models require knowledge of the momentum exchange frequency and dependence of the ion mobilities on the electric field when the ions are in equilibrium with the latter. To this end an auxiliary Monte-Carlo scheme is constructed. It is demonstrated that the drift-diffusion approximation can overestimate ion transport in simulations of RF-driven discharges with heavy ion species operated in the γ mode at the atmospheric pressure or in all discharge simulations for lower pressures. This can lead to exaggerated plasma densities and incorrect profiles provided by the drift-diffusion models. Therefore, the hybrid code version featuring the full ion fluid model should be favored against the more popular drift-diffusion model, noting that the suggested numerical scheme for the former model implies only a small additional computational cost. (paper)

  4. Research on permeability of poly(ethylene) terephthalate track membranes modified in plasma

    International Nuclear Information System (INIS)

    Dmitriev, S.N.; Kravets, L.I.; Sleptsov, V.V.; Elinson, V.M.; Potryasaj, V.V.

    2001-01-01

    The properties of poly(ethylene) terephthalate track membranes subjected to the plasma RF-discharge treatment in air have been investigated. The effect of the treatment conditions in plasma on the structure and the properties of the membranes formed in the gas-discharge etching has been studied. It has been figured out that the influence of the air plasma on the membranes under study leads to a formation of asymmetric membranes with a higher flow rate, the structure and chemical composition of their superficial layer are changed. It is shown that the presence of the modified layer on the surface of the membranes causes changing their hydrodynamic characteristics - water permeability of the membranes treated in plasma in a greater degree depends upon pH of the filtered solution. (author)

  5. Radio-frequency oxygen-plasma-enhanced pulsed laser deposition of IGZO films

    Science.gov (United States)

    Chou, Chia-Man; Lai, Chih-Chang; Chang, Chih-Wei; Wen, Kai-Shin; Hsiao, Vincent K. S.

    2017-07-01

    We demonstrate the crystalline structures, optical transmittance, surface and cross-sectional morphologies, chemical compositions, and electrical properties of indium gallium zinc oxide (IGZO)-based thin films deposited on glass and silicon substrates through pulsed laser deposition (PLD) incorporated with radio-frequency (r.f.)-generated oxygen plasma. The plasma-enhanced pulsed laser deposition (PEPLD)-based IGZO thin films exhibited a c-axis-aligned crystalline (CAAC) structure, which was attributed to the increase in Zn-O under high oxygen vapor pressure (150 mTorr). High oxygen vapor pressure (150 mTorr) and low r.f. power (10 W) are the optimal deposition conditions for fabricating IGZO thin films with improved electrical properties.

  6. Liquid assisted plasma enhanced chemical vapour deposition with a non-thermal plasma jet at atmospheric pressure

    Czech Academy of Sciences Publication Activity Database

    Schäfer, J.; Fricke, K.; Mika, Filip; Pokorná, Zuzana; Zajíčková, L.; Foest, R.

    2017-01-01

    Roč. 630, MAY 30 (2017), s. 71-78 ISSN 0040-6090 R&D Projects: GA MŠk(CZ) LO1212; GA MŠk ED0017/01/01 Institutional support: RVO:68081731 Keywords : plasma jet * liquid assisted plasma enhanced chemical * vapour deposition * silicon oxide Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering OBOR OECD: Coating and films Impact factor: 1.879, year: 2016

  7. RF start-up and sustainment experiments on the TST-2-K spherical tokamak

    International Nuclear Information System (INIS)

    Ejiri, A.; Takase, Y.; Kasahara, H.; Yamada, T.; Hanada, K.; Sato, K. N.; Zushi, H.; Nakamura, K.; Sakamoto, M.; Idei, H.; Hasegawa, M.; Iyomasa, A.; Imamura, N.; Esaki, K.; Kitaguchi, M.; Sasaki, K.; Hoshika, H.; Mitarai, O.; Nishino, N.

    2006-01-01

    Plasma start-up and sustainment without an inductive field have been studied in the TST-2-K spherical tokamak using high power RF sources (8.2 GHz/up to 170 kW). Steady state discharges with a plasma current of 4 kA were achieved. The line integrated density was about 3 x 10 17 m -2 and the electron temperature was 160 eV. A truncated equilibrium was introduced to reproduce magnetic measurements. It was found that a positive Pfirsch-Schlueter current in the open field line region at the outboard boundary makes a significant contribution to the current. Insensitivity of the current to variations in the vertical field and RF power variation was also found

  8. RF Reactive Magnetron Sputter Deposition of Silicon Sub-Oxides

    NARCIS (Netherlands)

    Hattum, E.D. van

    2007-01-01

    RF reactive magnetron plasma sputter deposition of silicon sub oxide E.D. van Hattum Department of Physics and Astronomy, Faculty of Sciences, Utrecht University The work described in the thesis has been inspired and stimulated by the use of SiOx layers in the direct inductive printing technology,

  9. Radio-frequency plasma spraying of ceramics

    International Nuclear Information System (INIS)

    Okada, T.; Hamatani, H.; Yoshida, T.

    1989-01-01

    This study was aimed at developing a novel spraying process using a radio-frequency (rf) plasma. Experiments of Al 2 O 3 and ZrO 2 - 8 wt% Y 2 O 3 spraying showed that the initial powder size was the most important parameter for depositing dense coatings. The optimum powder sizes of Al 2 O 3 and ZrO 2 - 8 wt% Y 2 O 3 were considered to be around 100 and 80 μm, respectively. The use of such large-size powders compared with those used by conventional dc plasma spraying made it possible to deposit adherent ceramics coatings of 150 to 300 μm on as-rolled SS304 substrates. It was also shown that low particle velocity of about 10 m/s, which is peculiar to rf plasma spraying, was sufficient for particle deformation, though it imposed a severe limitation on the substrate position. These experimental results prove that rf plasma spraying is an effective process and a strong candidate to open new fields of spraying applications

  10. Titanium dioxide (TIO2) thin film and plasma properties in RF magnetron sputtering

    International Nuclear Information System (INIS)

    Ali, Riyaz Ahmad Mohamed; Nayan, Nafarizal

    2013-01-01

    Lately, titanium dioxide (TiO 2 ) films with anatase crystalline property received numerous attentions as unique material properties. There are wide applications of TiO 2 thin film such as for photocatalytic application in solar cell. In the present study, radio frequency (RF) magnetron sputtering technique has been used to produce high dense, homogeneously controllable film layer at low deposition temperature using titanium (Ti) target. The diameter of the Ti target is 3 inch with fixed discharge power of 400W. Magnetron sputtering plasma has been produced in high purity 99.99% Argon (Ar) and 99.99% Oxygen (O 2 ) environment pressure ranging from 5 to 20 mTorr. The TiO2 were growth on silicon and glass substrates. Substrate temperature during deposition was kept constant at 400°C. The distance between target and substrate holder was maintain at 14 cm with rotation of 10 rotation-per-minutes. Our X-ray diffraction result, shows anatase crystalline successfully formed with characterization peaks of plane (101) at 2θ = 25.28°, plane (202) at 2θ = 48.05° and plane (211) at 2θ = 55.06°. In addition, it is our interest to study the plasma properties and optical spectrum of Ti, Ti+ , O- , ArM and Ar+ in the chamber during the deposition process. Result of emission line intensities, electron density and temperature from optical spectroscope and Langmuir probe will be discuss further during the workshop. This works were supported by Graduate Incentive Scheme of Universiti Tun Hussein Onn Malaysia (UTHM) and Fundamental Research Grant Scheme of Ministry of Higher Education, Malaysia. (author)

  11. Inductive current startup in large tokamaks with expanding minor radius and rf assist

    International Nuclear Information System (INIS)

    Borowski, S.K.

    1984-02-01

    Auxiliary rf heating of electrons before and during the current-rise phase of a large tokamak, such as the Fusion Engineering Device (R = 4.8 m, a = 1.3 m, sigma = 1.6, B/sub T/ = 3.62 T), is examined as a means of reducing both the initiation loop voltage and resistive flux expenditure during startup. Prior to current initiation, 1 to 2 MW of electron cyclotron resonance heating power at approx. 90 GHz is used to create a small volume of high conductivity plasma (T/sub e/ approx. = 100 eV, n/sub e/ approx. = 10 19 m -3 ) near the upper hybrid resonance (UHR) region. This plasma conditioning permits a small radius (a 0 approx. = 0.2 to 0.4 m) current channel to be established with a relatively low initial loop voltage (less than or equal to 25 V as opposed to approx. 100 V without rf assist). During the subsequent plasma expansion and current ramp phase, a combination of rf heating (up to 5 MW) and current profile control leads to a substantial savings in volt-seconds by: (1) minimizing the resistive flux consumption; and (2) maintaining the internal flux at or near the flat profile limit

  12. Diagnostics of ballistic electrons in a dc/rf hybrid capacitively coupled discharge

    International Nuclear Information System (INIS)

    Xu Lin; Chen, Lee; Funk, Merritt; Ranjan, Alok; Hummel, Mike; Bravenec, Ron; Sundararajan, Radha; Economou, Demetre J.; Donnelly, Vincent M.

    2008-01-01

    The energy distribution of ballistic electrons in a dc/rf hybrid parallel-plate capacitively coupled plasma reactor was measured. Ballistic electrons originated as secondaries produced by ion and electron bombardment of the electrodes. The energy distribution of ballistic electrons peaked at the value of the negative bias applied to the dc electrode. As that bias became more negative, the ballistic electron current on the rf substrate electrode increased dramatically. The ion current on the dc electrode also increased

  13. Investigation of radiofrequency plasma sources for space travel

    International Nuclear Information System (INIS)

    Charles, C; Boswell, R W; Takahashi, K

    2012-01-01

    Optimization of radiofrequency (RF) plasma sources for the development of space thrusters differs from other applications such as plasma processing of materials since power efficiency, propellant usage, particle acceleration or heating become driving parameters. The development of two RF (13.56 MHz) plasma sources, the high-pressure (∼1 Torr) capacitively coupled ‘pocket rocket’ plasma micro-thruster and the low-pressure (∼1 mTorr) inductively coupled helicon double layer thruster (HDLT), is discussed within the context of mature and emerging electric propulsion devices. The density gradient in low-pressure expanding RF plasmas creates an electric field that accelerates positive ions out of the plasma. Generally, the total potential drop is similar to that of a wall sheath allowing the plasma electrons to neutralize the ion beam. A high-pressure expansion with no applied magnetic field can result in large dissociation rates and/or a collimated beam of ions of small area and a flowing heated neutral beam (‘pocket rocket’). A low-pressure expansion dominated by a magnetic field can result in the formation of electric double layers which produce a very directed neutralized beam of ions of large area (HDLT). (paper)

  14. Investigation of radiofrequency plasma sources for space travel

    Science.gov (United States)

    Charles, C.; Boswell, R. W.; Takahashi, K.

    2012-12-01

    Optimization of radiofrequency (RF) plasma sources for the development of space thrusters differs from other applications such as plasma processing of materials since power efficiency, propellant usage, particle acceleration or heating become driving parameters. The development of two RF (13.56 MHz) plasma sources, the high-pressure (˜1 Torr) capacitively coupled ‘pocket rocket’ plasma micro-thruster and the low-pressure (˜1 mTorr) inductively coupled helicon double layer thruster (HDLT), is discussed within the context of mature and emerging electric propulsion devices. The density gradient in low-pressure expanding RF plasmas creates an electric field that accelerates positive ions out of the plasma. Generally, the total potential drop is similar to that of a wall sheath allowing the plasma electrons to neutralize the ion beam. A high-pressure expansion with no applied magnetic field can result in large dissociation rates and/or a collimated beam of ions of small area and a flowing heated neutral beam (‘pocket rocket’). A low-pressure expansion dominated by a magnetic field can result in the formation of electric double layers which produce a very directed neutralized beam of ions of large area (HDLT).

  15. Typical parameters of the plasma chemical similarity in non-isothermal reactive plasmas

    International Nuclear Information System (INIS)

    Gundermann, S.; Jacobs, H.; Miethke, F.; Rutsher, A.; Wagner, H.E.

    1996-01-01

    The substance of physical similarity principles is contained in parameters which govern the comparison of different realizations of a model device. Because similarity parameters for non-isothermal plasma chemical reactors are unknown to a great extent, an analysis of relevant equations is given together with some experimental results. Modelling of the reactor and experimental results for the ozone synthesis are presented

  16. Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System

    Directory of Open Access Journals (Sweden)

    Shiu-Ko JangJian

    2007-01-01

    Full Text Available The plasma clean in a plasma-enhanced chemical vapor deposition (PECVD system plays an important role to ensure the same chamber condition after numerous film depositions. The periodic and applicable plasma clean in deposition chamber also increases wafer yield due to less defect produced during the deposition process. In this study, the plasma clean rate (PCR of silicon oxide is investigated after the silicon nitride deposited on Cu and silicon oxide substrates by remote plasma system (RPS, respectively. The experimental results show that the PCR drastically decreases with Cu substrate compared to that with silicon oxide substrate after numerous silicon nitride depositions. To understand the substrate effect on PCR, the surface element analysis and bonding configuration are executed by X-ray photoelectron spectroscopy (XPS. The high resolution inductively coupled plasma mass spectrometer (HR-ICP-MS is used to analyze microelement of metal ions on the surface of shower head in the PECVD chamber. According to Cu substrate, the results show that micro Cu ion and the CuOx bonding can be detected on the surface of shower head. The Cu ion contamination might grab the fluorine radicals produced by NF3 ddissociation in the RPS and that induces the drastic decrease on PCR.

  17. RF-sheath assessment of ICRF antenna geometry for long pulses

    International Nuclear Information System (INIS)

    Colas, L.; Bremond, S.

    2003-01-01

    Monitoring powered ion cyclotron resonance frequency (ICRF) antennas in magnetic fusion devices has revealed localized modifications of the plasma edge in the antenna shadow, most of them probably related to an enhanced polarization of the scrape-off layer (SOL) through radio-frequency (RF) sheath rectification. Although tolerable on present short RF pulses, sheaths should be minimized, as they may hinder proper operation of steady-state antennas and other subsystems connected magnetically to them, such as lower hybrid grills. As a first step towards mitigating RF sheaths in the design of future antennas, the present paper analyses the spatial structure of sheath potential maps in their vicinity, in relation with the 3D topology of RF near fields and the geometry of antenna front faces. Various combinations of poloidal radiating straps are first considered, and results are confronted to those inferred from transmission line theory. The dependence of sheath potentials on RF voltages or RF currents is studied. The role of RF near-field symmetries along tilted field lines is stressed to interpret such effects as that of strap phasing. A generalization of the 'dipole effect' is proposed. With similar arguments, the behavior of Faraday screen corners, where hot spots concentrate on Tore-Supra (TS), is then studied. The merits of aligning the antenna structure with the tilted magnetic field are thus discussed. The effect of switching from TS (high RF voltage near corners) to ITER-like electrical configurations of the straps (high voltage near equatorial plane) is also analyzed. (authors)

  18. Chemical mechanical polishing characteristics of ITO thin film prepared by RF magnetron sputtering

    International Nuclear Information System (INIS)

    Lee, Kang-Yeon; Choi, Gwon-Woo; Kim, Yong-Jae; Choi, Youn-Ok; Kim, Nam-Oh

    2012-01-01

    Indium-tin-oxide (ITO) thin films have attracted intensive interest because of their unique properties of good conductivity, high optical transmittance over the visible region and easy patterning ability. ITO thin films have found many applications in anti-static coatings, thermal heaters, solar cells, flat panel displays (FPDs), liquid crystal displays (LCDs), electroluminescent devices, sensors and organic light-emitting diodes (OLEDs). ITO thin films are generally fabricated by using various methods, such as spraying, chemical vapor deposition (CVD), evaporation, electron gun deposition, direct current electroplating, high frequency sputtering, and reactive sputtering. In this research, ITO films were grown on glass substrates by using a radio-frequency (RF) magnetron sputtering method. In order to achieve a high transmittance and a low resistivity, we examined the various film deposition conditions, such as substrate temperature, working pressure, annealing temperature, and deposition time. Next, in order to improve the surface quality of the ITO thin films, we performed a chemical mechanical polishing (CMP) with different process parameters and compared the electrical and the optical properties of the polished ITO thin films. The best CMP conditions with a high removal rate, low nonuniformity, low resistivity and high transmittance were as follows: platen speed, head speed, polishing time, and slurry flow rate of 30 rpm, 30 rpm, 60 sec, and 60 ml/min, respectively.

  19. Temperature dependence of InN film deposition by an RF plasma-assisted reactive ion beam sputtering deposition technique

    International Nuclear Information System (INIS)

    Shinoda, Hiroyuki; Mutsukura, Nobuki

    2005-01-01

    Indium nitride (InN) films were deposited on Si(100) substrates using a radiofrequency (RF) plasma-assisted reactive ion beam sputtering deposition technique at various substrate temperatures. The X-ray diffraction patterns of the InN films suggest that the InN films deposited at substrate temperatures up to 370 deg C were cubic crystalline InN; and at 500 deg C, the InN film was hexagonal crystalline InN. In a scanning electron microscope image of the InN film surface, facets of cubic single-crystalline InN grains were clearly observed on the InN film deposited at 370 deg C. The inclusion of metallic indium appeared on the InN film deposited at 500 deg C

  20. Destruction of chemical warfare surrogates using a portable atmospheric pressure plasma jet

    Science.gov (United States)

    Škoro, Nikola; Puač, Nevena; Živković, Suzana; Krstić-Milošević, Dijana; Cvelbar, Uroš; Malović, Gordana; Petrović, Zoran Lj.

    2018-01-01

    Today's reality is connected with mitigation of threats from the new chemical and biological warfare agents. A novel investigation of cold plasmas in contact with liquids presented in this paper demonstrated that the chemically reactive environment produced by atmospheric pressure plasma jet (APPJ) is potentially capable of rapid destruction of chemical warfare agents in a broad spectrum. The decontamination of three different chemical warfare agent surrogates dissolved in liquid is investigated by using an easily transportable APPJ. The jet is powered by a kHz signal source connected to a low-voltage DC source and with He as working gas. The detailed investigation of electrical properties is performed for various plasmas at different distances from the sample. The measurements of plasma properties in situ are supported by the optical spectrometry measurements, whereas the high performance liquid chromatography measurements before and after the treatment of aqueous solutions of Malathion, Fenitrothion and Dimethyl Methylphosphonate. These solutions are used to evaluate destruction and its efficiency for specific neural agent simulants. The particular removal rates are found to be from 56% up to 96% during 10 min treatment. The data obtained provide basis to evaluate APPJ's efficiency at different operating conditions. The presented results are promising and could be improved with different operating conditions and optimization of the decontamination process.

  1. Ion energy and angular distributions in inductively coupled Argon RF discharges

    International Nuclear Information System (INIS)

    Woodworth, J.R.; Riley, M.E.; Meister, D.C.

    1996-03-01

    We report measurements of the energies and angular distributions of positive ions in an inductively coupled argon plasma in a GEC reference cell. Use of two separate ion detectors allowed measurement of ion energies and fluxes as a function of position as well as ion angular distributions on the discharge centerline. The inductive drive on our system produced high plasma densities (up to 10 12 /cm 3 electron densities) and relatively stable plasma potentials. As a result, ion energy distributions typically consisted of a single feature well separated from zero energy. Mean ion energy was independent of rf power and varied inversely with pressure, decreasing from 29 eV to 12 eV as pressure increased form 2.4 m Torr to 50 mTorr. Half-widths of the ion angular distributions in these experiments varied from 5 degrees to 12.5 degrees, or equivalently, transverse temperatures varied form 0.2 to 0.5 eV with the distributions broadening as either pressure or RF power were increased

  2. Non-inductive current drive and RF heating in SST-1 tokamak

    International Nuclear Information System (INIS)

    2000-01-01

    Steady state superconducting tokamak (SST-1) machine is being developed for 1000 sec operation at different operating parameters. Radio Frequency (RF) and neutral beam injection (NBI) methods are planned in SST-1 for noninductive current drive and heating. In this paper, we describe the non-inductive current drive and RF heating methods that are being developed for this purpose. SST-1 is a large aspect ratio tokamak configured to run double-null divertor plasmas with significant elongation (κ = 1.7-1.9) and triangularity (δ = 0.4-0.7). SST-1 has a major radius of 1.1 in and minor radius of 0.2 m. Circular and shaped plasma experiments would be conducted at 1.5 and 3 T toroidal magnetic field in three different phases with I p = 110 kA and 220 kA. Two main factors have been considered during the development of auxiliary systems, namely, high heat flux (1 MW/m 2 ) incident on the plasma facing antennae components and fast feedback for constant power input due to small energy confinement time (∼ 10 ms). (author)

  3. Potential formation in the plasma confinement region of a radio-frequency plugged linear device

    International Nuclear Information System (INIS)

    Fujita, Hideki; Kumazawa, Ryuhei; Howald, A.M.; Okamura, Shoichi; Sato, Teruyuki; Adati, Keizo; Garner, H.R.; Nishimura, Kiyohiko.

    1987-08-01

    Plasma potential formation in an open-ended plasma confinement system with RF plugging (the RFC-XX-M device) is investigated. The plasma potential in the central confinement region is measured with a heavy ion beam probe system and potentials at the RF plug section are measured with multi-grid energy analyzers. The measured plasma potential is compared with that deduced from the generalized Pastukhov formula. Results show that the plasma potential develops as an ambipolar potential to equate ion and electron end losses. During RF plugging, electrons are heated by Landau damping, while ions are not heated since adiabatic conditions apply during ion plugging in this experiment. (author)

  4. A comprehensive study of different gases in inductively coupled plasma torch operating at one atmosphere

    International Nuclear Information System (INIS)

    Punjabi, Sangeeta B.; Joshi, N. K.; Mangalvedekar, H. A.; Lande, B. K.; Das, A. K.; Kothari, D. C.

    2012-01-01

    A numerical study is done to understand the possible operating regimes of RF-ICP torch (3 MHz, 50 kW) using different gases for plasma formation at atmospheric pressure. A two dimensional numerical simulation of RF-ICP torch using argon, nitrogen, oxygen, and air as plasma gas has been investigated using computational fluid dynamic (CFD) software fluent (c) . The operating parameters varied here are central gas flow, sheath gas flow, RF-power dissipated in plasma, and plasma gas. The temperature contours, flow field, axial, and radial velocity profiles were investigated under different operating conditions. The plasma resistance, inductance of the torch, and the heat distribution for various plasma gases have also been investigated. The plasma impedance of ICP torch varies with different operating parameters and plays an important role for RF oscillator design and power coupling. These studies will be useful to decide the design criteria for ICP torches required for different material processing applications.

  5. SISAK liquid-liquid extraction experiments with preseparated {sup 257}Rf

    Energy Technology Data Exchange (ETDEWEB)

    Omtvedt, Jon Petter; Alstad, J.; Breivik, H. [University of Oslo, Department of Chemistry, Oslo (NO)] (and others)

    2002-06-01

    The SISAK liquid-liquid extraction system was used to extract 4.0-s {sup 257}Rf. The {sup 257}Rf was produced in the reaction {sup 208}Pb({sup 50}Ti, 1n){sup 257}Rf with 237-MeV beam energy on target, separated in the Berkeley Gas-filled Separator (BGS) and transferred to a gas jet using the Recoil Transfer Chamber (RTC). The activity delivered by the gas jet was dissolved in 6-M HNO{sub 3} and Rf was extracted into 0.25-M dibutyl-phosphoric acid in toluene. This was the first time a transactinide, i.e., an element with Z{>=}104, was extracted and unequivocally identified by the SISAK system. Thus, this pilot experiment demonstrates that the fast liquid-liquid extraction system SISAK, in combination with liquid-scintillation detectors, can be used for investigating the chemical properties of the transactinides. The extraction result is in accordance with the behaviour shown by the Rf group IV homologues Zr and Hf. (author)

  6. Recent development on RF-driven multicusp H- ion sources

    International Nuclear Information System (INIS)

    Leung, K.N.; De Vries, G.J.; Kunkel, W.B.; Perkins, L.T.; Pickard, D.S.; Saadatmand, K.; Wengrow, A.B.; Williams, M.D.

    1996-06-01

    The radio-frequency (rf) driven multicusp source was originally developed for use in the Superconducting Super Collider injector. The source routinely provided 35 keV, 30 mA of beam at 0.1% duty factor. By using a new cesium dispensing system, beam current in excess of 100 mA and e/H - ∼1 have been observed. For pulse mode operation, the rf discharge can be started by means of a xenon flash lamp. Extracted electrons in the beam can be efficiently removed by employing a permanent magnet insert structure. Chopping of the H - beam can be accomplished by applying a pulsed positive voltage on the plasma electrode

  7. Control of plasma density distribution via wireless power transfer in an inductively coupled plasma

    International Nuclear Information System (INIS)

    Lee, Hee-Jin; Lee, Hyo-Chang; Kim, Young-Cheol; Chung, Chin-Wook

    2013-01-01

    With an enlargement of the wafer size, development of large-area plasma sources and control of plasma density distribution are required. To control the spatial distribution of the plasma density, wireless power transfer is applied to an inductively coupled plasma for the first time. An inner powered antenna and an outer resonant coil connected to a variable capacitor are placed on the top of the chamber. As the self-resonance frequency ω r of the resonant coil is adjusted, the power transfer rate from the inner powered coil to the outer resonant coil is changed and the dramatic evolution of the plasma density profile is measured. As ω r of the outer resonant coil changes from the non-resonant condition (where ω r is not the driving angular frequency ω rf ) to the resonant condition (where ω r = ω rf ), the plasma density profile evolves from a convex shape with maximal plasma density at the radial center into a concave shape with maximal plasma density in the vicinity of the resonant antenna coil. This result shows that the plasma density distribution can be successfully controlled via wireless resonance power transfer. (fast track communication)

  8. Frequency effects in silane plasmas for PECVD

    International Nuclear Information System (INIS)

    Howling, A.A.; Dorier, J.L.; Hollenstein, C.; Finger, F.; Kroll, U.

    1991-09-01

    It is generally recognised that the excitation frequency is an important parameter in rf plasma-assisted deposition. VHF silane plasmas (50-100 MHz) have been shown to produce high quality amorphous silicon films up to 20 A/s, and therefore the aim of this work is to compare the VHF range with the 13.56 MHz industrial frequency in the same reactor. The principal diagnostics used are electrical measurements and a CCD camera for spatially-resolved plasma-induced emission with Abel inversion of the plasma image. We present a comparative study of key discharge parameters such as deposition rates, plasma uniformity, ion impact energy, power transfer efficiency and powder formation for the rf range 13-70 MHz. (author) 5 figs., 19 refs

  9. Plasma Total Cysteine and Cardiovascular Risk Burden: Action and Interaction

    Directory of Open Access Journals (Sweden)

    Benedetta De Chiara

    2012-01-01

    Full Text Available We hypothesized that redox analysis could provide sensitive markers of the oxidative pathway associated to the presence of an increasing number of cardiovascular risk factors (RFs, independently of type. We classified 304 subjects without cardiovascular disease into 4 groups according to the total number of RFs (smoking, hypertension, hypercholesterolaemia, hyperhomocysteinaemia, diabetes, obesity, and their combination. Oxidative stress was evaluated by measuring plasma total and reduced homocysteine, cysteine (Cys, glutathione, cysteinylglycine, blood reduced glutathione, and malondialdehyde. Twenty-seven percent of subjects were in group 0 RF, 26% in 1 RF, 31% in 2 RF, and 16% in ≥3 RF. By multivariable ordinal regression analysis, plasma total Cys was associated to a higher number of RF (OR = 1.068; 95% CI = 1.027–1.110, =0.002. Total RF burden is associated with increased total Cys levels. These findings support a prooxidant effect of Cys in conjunction with RF burden, and shed light on the pathophysiologic role of redox state unbalance in preclinical atherosclerosis.

  10. Design of resonant converter based DC power supply for RF amplifier

    International Nuclear Information System (INIS)

    Mohan, Kartik; Suthar, Gajendra; Dalicha, Hrushikesh; Agarwal, Rohit; Trivedi, R.G.; Mukherjee, Aparajita

    2017-01-01

    ITER require 20 MW of RF power to a large variety of plasmas in the Ion Cyclotron frequency range for heating and driving plasma current. Nine RF sources of 2.5MW RF power level each collectively will accomplish the above requirement. Each RF source consists of SSPA, driver and end stage, above which driver and end stage amplifier are tube (Tetrode/Diacrode) based which requires auxiliary DC power source viz. filament, screen grid and control grid DC power supply. DC power supply has some stringent requirements like low stored energy, fast turn off, and low ripple value, etc. This paper will focus only on Zero Current Switching (ZCS) resonant converter based buck converter. This can serve the purpose of control grid and screen grid DC power supply for above requirement. IGBT switch will be used at 20 kHz so as to lower the filter requirement hence low stored energy and ripple in the output voltage. ZCS operation will also assist us in reducing EMI/EMC effect. Design of resonant tank circuit is important aspect of the converter as it forms the backbone of the complete system and basis of selection of other important parameters as well hence mathematical model analysis with the help of circuit equations for various modes have been shown as a part of selection criteria. Peak current through the switch, duty cycle, switching frequency will be the design parameters for selecting resonant tank circuit

  11. Online tuning of impedance matching circuit for long pulse inductively coupled plasma source operation—An alternate approach

    International Nuclear Information System (INIS)

    Sudhir, Dass; Bandyopadhyay, M.; Chakraborty, A.; Kraus, W.; Gahlaut, A.; Bansal, G.

    2014-01-01

    Impedance matching circuit between radio frequency (RF) generator and the plasma load, placed between them, determines the RF power transfer from RF generator to the plasma load. The impedance of plasma load depends on the plasma parameters through skin depth and plasma conductivity or resistivity. Therefore, for long pulse operation of inductively coupled plasmas, particularly for high power (∼100 kW or more) where plasma load condition may vary due to different reasons (e.g., pressure, power, and thermal), online tuning of impedance matching circuit is necessary through feedback. In fusion grade ion source operation, such online methodology through feedback is not present but offline remote tuning by adjusting the matching circuit capacitors and tuning the driving frequency of the RF generator between the ion source operation pulses is envisaged. The present model is an approach for remote impedance tuning methodology for long pulse operation and corresponding online impedance matching algorithm based on RF coil antenna current measurement or coil antenna calorimetric measurement may be useful in this regard

  12. Advanced antenna system for Alfven wave plasma heating and current drive in TCABR tokamak

    International Nuclear Information System (INIS)

    Ruchko, L.F.; Ozono, E.; Galvao, R.M.O.; Nascimento, I.C.; Degasperi, F.T.; Lerche, E.

    1998-01-01

    An advanced antenna system that has been developed for investigation of Alfven wave plasma heating and current drive in the TCABR tokamak is described. The main goal was the development of such a system that could insure the excitation of travelling single helicity modes with predefined wave mode numbers M and N. The system consists of four similar modules with poloidal windings. The required spatial spectrum is formed by proper phasing of the RF feeding currents. The impedance matching of the antenna with the four-phase oscillator is accomplished by resonant circuits which form one assembly unit with the RF feeders. The characteristics of the antenna system design with respect to the antenna-plasma coupling and plasma wave excitation, for different phasing of the feeding currents, are summarised. The antenna complex impedance Z=Z R +Z I is calculated taking into account both the plasma response to resonant excitation of fast Alfven waves and the nonresonant excitation of vacuum magnetic fields in conducting shell. The matching of the RF generator with the antenna system during plasma heating is simulated numerically, modelling the plasma response with mutually coupled effective inductances with corresponding active Z R and reactive Z I impedances. The results of the numerical simulation of the RF system performance, including both the RF magnetic field spectrum analysis and the modeling of the RF generator operation with plasma load, are presented. (orig.)

  13. An amplitude modulated radio frequency plasma generator

    Science.gov (United States)

    Lei, Fan; Li, Xiaoping; Liu, Yanming; Liu, Donglin; Yang, Min; Xie, Kai; Yao, Bo

    2017-04-01

    A glow discharge plasma generator and diagnostic system has been developed to study the effects of rapidly variable plasmas on electromagnetic wave propagation, mimicking the plasma sheath conditions encountered in space vehicle reentry. The plasma chamber is 400 mm in diameter and 240 mm in length, with a 300-mm-diameter unobstructed clear aperture. Electron densities produced are in the mid 1010 electrons/cm3. An 800 W radio frequency (RF) generator is capacitively coupled through an RF matcher to an internally cooled stainless steel electrode to form the plasma. The RF power is amplitude modulated by a waveform generator that operates at different frequencies. The resulting plasma contains electron density modulations caused by the varying power levels. A 10 GHz microwave horn antenna pair situated on opposite sides of the chamber serves as the source and detector of probe radiation. The microwave power feed to the source horn is split and one portion is sent directly to a high-speed recording oscilloscope. On mixing this with the signal from the pickup horn antenna, the plasma-induced phase shift between the two signals gives the path-integrated electron density with its complete time dependent variation. Care is taken to avoid microwave reflections and extensive shielding is in place to minimize electronic pickup. Data clearly show the low frequency modulation of the electron density as well as higher harmonics and plasma fluctuations.

  14. Review: Plasma-enhanced chemical vapor deposition of nanocrystalline diamond

    Directory of Open Access Journals (Sweden)

    Katsuyuki Okada

    2007-01-01

    Full Text Available Nanocrystalline diamond films have attracted considerable attention because they have a low coefficient of friction and a low electron emission threshold voltage. In this paper, the author reviews the plasma-enhanced chemical vapor deposition (PE-CVD of nanocrystalline diamond and mainly focuses on the growth of nanocrystalline diamond by low-pressure PE-CVD. Nanocrystalline diamond particles of 200–700 nm diameter have been prepared in a 13.56 MHz low-pressure inductively coupled CH4/CO/H2 plasma. The bonding state of carbon atoms was investigated by ultraviolet-excited Raman spectroscopy. Electron energy loss spectroscopy identified sp2-bonded carbons around the 20–50 nm subgrains of nanocrystalline diamond particles. Plasma diagnostics using a Langmuir probe and the comparison with plasma simulation are also reviewed. The electron energy distribution functions are discussed by considering different inelastic interaction channels between electrons and heavy particles in a molecular CH4/H2 plasma.

  15. Oak Ridge rf Test Facility

    International Nuclear Information System (INIS)

    Gardner, W.L.; Hoffman, D.J.; McCurdy, H.C.; McManamy, T.J.; Moeller, J.A.; Ryan, P.M.

    1985-01-01

    The rf Test Facility (RFTF) of Oak Ridge National Laboratory (ORNL) provides a national facility for the testing and evaluation of steady-state, high-power (approx.1.0-MW) ion cyclotron resonance heating (ICRH) systems and components. The facility consists of a vacuum vessel and two fully tested superconducting development magnets from the ELMO Bumpy Torus Proof-of-Principle (EBT-P) program. These are arranged as a simple mirror with a mirror ratio of 4.8. The axial centerline distance between magnet throat centers is 112 cm. The vacuum vessel cavity has a large port (74 by 163 cm) and a test volume adequate for testing prototypic launchers for Doublet III-D (DIII-D), Tore Supra, and the Tokamak Fusion Test Reactor (TFTR). Attached to the internal vessel walls are water-cooled panels for removing the injected rf power. The magnets are capable of generating a steady-state field of approx.3 T on axis in the magnet throats. Steady-state plasmas are generated in the facility by cyclotron resonance breakdown using a dedicated 200-kW, 28-GHz gyrotron. Available rf sources cover a frequency range of 2 to 200 MHz at 1.5 kW and 3 to 18 MHz at 200 kW, with several sources at intermediate parameters. Available in July 1986 will be a >1.0-MW, cw source spanning 40 to 80 MHz. 5 figs

  16. Present status of two R.F. heating schemes: I.C.R.H. and L.H.R.H

    International Nuclear Information System (INIS)

    Consoli, T.

    1977-01-01

    Among the large number of wave-plasma interaction, Ion-Cyclotron Resonant Heating (I.C.R.H.) and Lower Hybrid Resonant Heating (L.H.R.H.), are two promising additional R.F. heating schemes for toroidal hot plasma. They both offer the advantage of using power generators which requires a moderate development for next generation machines. It seems important to try to state in the limits of this paper the present experimental situation of these two R.F. heating methods as it results from the vast literature published from the last European Conference

  17. Electric field measurements in the sheath of an argon RF discharge by probing with microparticles under varying gravity conditions

    NARCIS (Netherlands)

    Beckers, J.; Stoffels, W.W.; Kroesen, G.M.W.; Ockenga, T.; Wolter, M.; Kersten, H.

    2010-01-01

    The electric field profile in the plasma sheath of an argon rf plasma has been determined by measuring the equilibrium height and the resonance frequency of plasma-confined microparticles. In order to determine the electric field structure at any position in the plasma sheath without the discharge

  18. Interpretation of PISCES -- A RF antenna system experimental results

    International Nuclear Information System (INIS)

    Rothweil, D.A.; Phelps, D.A.; Doerner, R.

    1995-10-01

    The paper describes experimental data from rf coupling experiments using one to four coil antenna arrays that encircle a linear magnetized plasma column. Experimental results using single turn coil that produce symmetric (i.e. m = 0), dipole (m = 1), and radial rf magnetic fields for coupling to ion waves are compared. By operating without a Faraday shield, it was observed for the first time that the plasma resistive load seen by these different antenna types tends to increase with the number of turns to at least the second power. A four-turn m = 0 coil experienced a record 3--5 Ω loading, corresponding to over 90% power coupling to the plasma. A four-turn m = 1 coil experienced up to 1--1.5 Ω loading, also higher than previous observations. First time observations using a two coil array of m = 0 coil are also reported. As predicted, the loading decreases with increasing phase between coil from 0 degree to 180 degree. Experiments using four coil arrays were difficult to optimize and interpret primarily due to complexity of the manual tuning. To facilitate this optimization in the future, a proposed feedback control system that automatically matches load variations between 0.2 and 10 Ω is described

  19. Studies on the Extraction Region of the Type VI RF Driven H- Ion Source

    Science.gov (United States)

    McNeely, P.; Bandyopadhyay, M.; Franzen, P.; Heinemann, B.; Hu, C.; Kraus, W.; Riedl, R.; Speth, E.; Wilhelm, R.

    2002-11-01

    IPP Garching has spent several years developing a RF driven H- ion source intended to be an alternative to the current ITER (International Thermonuclear Experimental Reactor) reference design ion source. A RF driven source offers a number of advantages to ITER in terms of reduced costs and maintenance requirements. Although the RF driven ion source has shown itself to be competitive with a standard arc filament ion source for positive ions many questions still remain on the physics behind the production of the H- ion beam extracted from the source. With the improvements that have been implemented to the BATMAN (Bavarian Test Machine for Negative Ions) facility over the last two years it is now possible to study both the extracted ion beam and the plasma in the vicinity of the extraction grid in greater detail. This paper will show the effect of changing the extraction and acceleration voltage on both the current and shape of the beam as measured on the calorimeter some 1.5 m downstream from the source. The extraction voltage required to operate in the plasma limit is 3 kV. The perveance optimum for the extraction system was determined to be 2.2 x 10-6 A/V3/2 and occurs at 2.7 kV extraction voltage. The horizontal and vertical beam half widths vary as a function of the extracted ion current and the horizontal half width is generally smaller than the vertical. The effect of reducing the co-extracted electron current via plasma grid biasing on the H- current extractable and the beam profile from the source is shown. It is possible in the case of a silver contaminated plasma to reduce the co-extracted electron current to 20% of the initial value by applying a bias of 12 V. In the case where argon is present in the plasma, biasing is observed to have minimal effect on the beam half width but in a pure hydrogen plasma the beam half width increases as the bias voltage increases. New Langmuir probe studies that have been carried out parallel to the plasma grid (in the

  20. Atmospheric-pressure plasma jet

    Science.gov (United States)

    Selwyn, Gary S.

    1999-01-01

    Atmospheric-pressure plasma jet. A .gamma.-mode, resonant-cavity plasma discharge that can be operated at atmospheric pressure and near room temperature using 13.56 MHz rf power is described. Unlike plasma torches, the discharge produces a gas-phase effluent no hotter than 250.degree. C. at an applied power of about 300 W, and shows distinct non-thermal characteristics. In the simplest design, two concentric cylindrical electrodes are employed to generate a plasma in the annular region therebetween. A "jet" of long-lived metastable and reactive species that are capable of rapidly cleaning or etching metals and other materials is generated which extends up to 8 in. beyond the open end of the electrodes. Films and coatings may also be removed by these species. Arcing is prevented in the apparatus by using gas mixtures containing He, which limits ionization, by using high flow velocities, and by properly shaping the rf-powered electrode. Because of the atmospheric pressure operation, no ions survive for a sufficiently long distance beyond the active plasma discharge to bombard a workpiece, unlike low-pressure plasma sources and conventional plasma processing methods.

  1. Minority and mode conversion heating in (He-3)-H JET plasmas

    NARCIS (Netherlands)

    Van Eester, D.; Lerche, E.; Johnson, T. J.; Hellsten, T.; Ongena, J.; Mayoral, M. L.; Frigione, D.; Sozzi, C.; Calabro, G.; Lennholm, M.; Beaumont, P.; Blackman, T.; Brennan, D.; Brett, A.; Cecconello, M.; Coffey, I.; Coyne, A.; Crombe, K.; Czarnecka, A.; Felton, R.; Johnson, M. G.; Giroud, C.; Gorini, G.; Hellesen, C.; Jacquet, P.; Kazakov, Y.; Kiptily, V.; Knipe, S.; Krasilnikov, A.; Lin, Y.; Maslov, M.; Monakhov, I.; Noble, C.; Nocente, M.; Pangioni, L.; Proverbio, I.; Stamp, M.; Studholme, W.; Tardocchi, M.; Versloot, T. W.; Vdovin, V.; Whitehurst, A.; Wooldridge, E.; Zoita, V.

    2012-01-01

    Radio frequency (RF) heating experiments have recently been conducted in JET (He-3)-H plasmas. This type of plasmas will be used in ITER's non-activated operation phase. Whereas a companion paper in this same PPCF issue will discuss the RF heating scenario's at half the nominal magnetic

  2. 2D potential structures induced by RF sheaths coupled with transverse currents in front of ICRH antenna

    International Nuclear Information System (INIS)

    Faudot, E.; Heuraux, S.; Colas, L.

    2004-01-01

    Sheaths are space charge regions at the plasma-wall. They are induced by the differential inertia between ions and electrons, and without external perturbation, they create a floating potential between the neutral plasma and the walls. In Tokamaks, these sheaths are locally enhanced by the RF (radiofrequency) electric field generated by the ICRF (ion cyclotron resonance frequency) antennas used to heat magnetic fusion plasmas at very high temperature. RF sheaths are located at the connection points of magnetic field lines to the wall, or to the bumpers which protect the antenna or to any part of the antenna structure. The asymmetric behaviour of these oscillating sheaths rectifies RF potentials in the plasma in front of antenna, to finally create nonlinearly a DC potential which can be much higher than the floating potential. We study specifically how the space-time distribution of these RF and DC rectified potentials is modified when nearby flux tubes are allowed to exchange perpendicular polarization current. To simulate that, a 2-dimensional (2D) fluid code has been implemented to compute the 2D RF potential map in a plane perpendicular to magnetic lines, and within the flute approximation the whole 3-dimensional potential map is deduced. In simulation, we consider a homogeneous transverse conductivity and use a 'test' potential map having, in absence of transverse currents, a Gaussian shape characterized by its width r 0 and its amplitude φ 0 . As a function of these 2 parameters (normalized respectively to a characteristic length for transverse transport and to the local temperature), we can estimate the peaking and the smoothing of the potential structure in the presence of polarization current. So, we are able to determine, for typical plasmas, the amplitude of DC potential peaks, particularly on antenna's corners, where hot spots appear during a shot. In Tore-supra conditions near antenna corners, potential structures that are shorter than 1 centimeter are

  3. 2D potential structures induced by RF sheaths coupled with transverse currents in front of ICRH antenna

    International Nuclear Information System (INIS)

    Faudot, E.; Heuraux, S.; Colas, L.

    2004-01-01

    Sheaths are space charge regions at the plasma-wall. They are induced by the differential inertia between ions and electrons, and without external perturbation, they create a floating potential between the neutral plasma and the walls. In tokamaks, these sheaths are locally enhanced by the RF (radiofrequency) electric field generated by the ICRF (ion cyclotron resonance frequency) antennas used to heat magnetic fusion plasmas at very high temperature. RF sheaths are located at the connection points of magnetic field lines to the wall, or to the bumpers which protect the antenna or to any part of the antenna structure. The asymmetric behaviour of these oscillating sheaths rectifies RF potentials in the plasma in front of antenna, to finally create nonlinearly a DC potential which can be much higher than the floating potential. We study specifically how the space-time distribution of these RF and DC rectified potentials is modified when nearby flux tubes are allowed to exchange perpendicular polarization current. To simulate that, a 2D (2-dimensional) fluid code has been implemented to compute the 2D RF potential map in a plane perpendicular to magnetic lines, and within the flute approximation the whole 3-dimensional potential map is deduced. In simulation, we consider a homogeneous transverse conductivity and use a 'test' potential map having, in absence of transverse currents, a Gaussian shape characterized by its width r0 and its amplitude φ 0 . As a function of these 2 parameters (normalized respectively to a characteristic length for transverse transport and to the local temperature), we can estimate the peaking and the smoothing of the potential structure in the presence of polarization current. So, we are able to determine, for typical plasmas, the amplitude of DC potential peaks, particularly on antenna's corners, where hot spots appear during a shot. In typical Tore Supra conditions near antenna corners potential structures less than centimetric are

  4. A two-temperature chemical non-equilibrium modeling of DC arc plasma

    International Nuclear Information System (INIS)

    Qian Haiyang; Wu Bin

    2011-01-01

    To a better understanding of non-equilibrium characteristics of DC arc plasma,a two-dimensional axisymmetric two-temperature chemical non-equilibrium (2T-NCE) model is applied for direct current arc argon plasma generator with water-cooled constrictor at atmospheric pressure. The results show that the electron temperature and heavy particle temperature has a relationship under different working parameters, indicating that DC arc plasma has a strong non-equilibrium characteristic, and the variation is obvious. (authors)

  5. Report of the workshop on rf heating in mirror systems

    International Nuclear Information System (INIS)

    Price, R.E.; Woo, J.T.

    1980-08-01

    This report is prepared from the proceedings of the Workshop on RF Heating in Magnetic Mirror Systems held at DOE Headquarters in Washington, DC, on March 10-12, 1980. The workshop was organized into four consecutive half-day sessions of prepared talks and one half-day discussion. The first session on tandem mirror concepts and program plans served to identify the opportunities for the application of rf power and the specific approaches that are being pursued. A summary of the ideas presented in this session is given. The following sessions of the workshop were devoted to an exposition of current theoretical and experimental knowledge on the interaction of rf power with magnetically confined, dense, high temperature plasmas at frequencies near the electron cyclotron resonance, lower hybrid resonance and ion cyclotron resonance (including magnetosonic) ranges. The conclusions from these proceedings are presented

  6. Radio Frequency Power in Plasmas: 12th Topical Conference. Proceedings

    International Nuclear Information System (INIS)

    Ryan, P.M.; Intrator, T.

    1997-01-01

    The twelfth Topical Conference on Radio Frequency Power in Plasmas was held in April, 1997, in Georgia, USA under the sponsorship of Oak Ridge National Laboratory of the US Department of Energy, the University of Wisconsin, and the American Physical Society. A large part of the conference was devoted to the ion cyclotron range of frequencies. Radio frequency contributions to the creation and maintenance of transport barriers to both particle and heat flux received a lot of attention. In addition to plasma heating, the use of RF as a versatile tool to drive current, shape profiles and stabilize plasmas was also discussed. The RF systems designs for ITER, ICRF heating advances on helical devices were among the topics of interest, so were progress in ion cyclotron codes, advanced launchers and technology, RF startup, general wave theory and the application of RF plasmas to material processing. A total of 103 papers were presented and are included in these proceedings. Out of these, 54 have been abstracted for the Energy Science and Technology database

  7. On the interplay between turbulence and poloidal flows in plasmas

    International Nuclear Information System (INIS)

    Hidalgo, C.; Pedrosa, M.A.; Garcia-Cortes, I.

    1999-01-01

    The radial profile of Reynolds stress has been measured in the plasma boundary region of tokamaks and stellarator plasmas. The electrostatic Reynolds stress (proportional to r E-tilde θ >) shows a radial gradient close to the velocity shear layer location, showing that this mechanism can drive significant poloidal flows in the plasma boundary region of fusion plasmas. The generation of poloidal flows by Ion Bernstein Wave (IBW) is under investigation in toroidal plasmas. The radial gradient in the Reynolds stress increases with RF power and radial electric fields are modified at the RF resonance layer. (author)

  8. Characteristics of nanosized zirconia prepared by plasma and chemical technique

    International Nuclear Information System (INIS)

    Kuznetsova, L.; Grabis, J.; Heidemane, G.

    2003-01-01

    The studied preparation method of zirconia using the plasma technique, azeotropic distillation and glycine routes ensure obtaining of nano sized powders with close average particle size but different crystallite size and phase composition. The sinterability of nano sized zirconia particles prepared by plasma technique or wet-chemical methods is similar and depends on the green density of pressed powders, improvement of with can be achieved by using of granulated precursors. (authors)

  9. Thin films preparation of the Ti-Al-O system by rf-sputtering;Preparacion de peliculas delgadas del sistema Ti-Al-O mediante rf-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Montes de Oca, J. A.; Ceballos A, J.; Galaviz P, J. [IPN, Centro de Investigacion en Ciencia Aplicada y Tecnologia Avanzada, Unidad Altamira, Km 14.5 Carretera Tampico-Puerto Industrial Altamira, 89600 Altamira, Tamaulipas (Mexico); Manaud, J. P.; Lahaye, M. [Centre National de la Recherche Scientifique, Institut de Chimie de la Matiere Condensee, Universite Bordeaux I, 87, Av. du Dr. Schweitzer, F-33608 Pessac-Cedex (France); Munoz S, J., E-mail: jmontedeocacv@ipn.m [IPN, Centro de Investigacion y de Estudios Avanzados, Unidad Queretaro, Libramiento Norponiente No. 2000, Fracc. Real de Juriquilla, 76230 Santiago de Queretaro, Qro. (Mexico)

    2010-07-01

    In the present work Ti-Al-O thin films were synthesized by rf-sputtering technique on glass and silicon (Si) substrates using Ti Al and Ti{sub 3}Al targets in a sputtering chamber with an Ar-O{sub 2} atmosphere. Ti-Al-O thin films were obtained varying experimental parameters such as oxygen percent fed to the reaction chamber, plasma power density and substrate temperature. The films deposited on glass substrates were used to evaluate their optical properties, while those deposited on Si substrates were used to evaluate mechanical and morphological properties. The crystalline structure, morphology, chemical composition and optical properties of the films were evaluated by X-ray diffraction, high-resolution scanning electron microscopy, Auger electron microscopy and visible UV spectroscopy. Films thicknesses were measured using a profiler. The roughness and mechanical properties such as hardness and Young modulus were analyzed by atomic force microscopy and nano indentation technique, respectively. (Author)

  10. Fundamental studies of fusion plasmas. Final report

    International Nuclear Information System (INIS)

    Aamodt, R.E.

    1998-01-01

    Lodestar has carried out a vigorous research program in the areas of rf, edge plasma and divertor physics, with emphasis largely geared towards improving the understanding and performance of ion-cyclotron heating and current drive (ICRF) systems. Additionally, a research program in the field of edge plasma and divertor modeling was initiated. Theoretical work on high power rf sheath formation for multi-strap rf arrays was developed and benchmarked against recent experimental data from the new JET A2 antennas. Sophisticated modeling tools were employed to understand the sheath formation taking into account realistic three-dimensional antenna geometry. A novel physics explanation of an observed anomaly in the low power loading of antennas was applied to qualitatively interpret data on DIII-D in terms of rf sheaths, and potential applications of the idea to develop a near-field sheath diagnostic were explored. Other rf-wave related topics were also investigated. Full wave ICRF modeling studies were carried out in support of ongoing and planned tokamaks experiments, including the investigation of low frequency plasma heating and current drive regimes for IGNITOR. In a cross-disciplinary study involving both MHD and ICRF physics, ponderomotive feedback stabilization by rf was investigated as a potential means of controlling external kink mode disruptions. In another study, the instability of the ion hybrid wave (IHW) in the presence of fusion alpha particles was studied. In the field of edge plasma and divertor modeling studies, Lodestar began the development of a theory of generalized ballooning and sheath instabilities in the scrape off layer (SOL) of divertor tokamaks. A detailed summary of the technical progress in these areas during the contract period is included, as well as where references to published work can be found. A separate listing of publications, meeting abstracts, and other presentations is also given at the end of this final report

  11. Auxiliary plasma heating and fueling models for use in particle simulation codes

    International Nuclear Information System (INIS)

    Procassini, R.J.; Cohen, B.I.

    1989-01-01

    Computational models of a radiofrequency (RF) heating system and neutral-beam injector are presented. These physics packages, when incorporated into a particle simulation code allow one to simulate the auxiliary heating and fueling of fusion plasmas. The RF-heating package is based upon a quasilinear diffusion equation which describes the slow evolution of the heated particle distribution. The neutral-beam injector package models the charge exchange and impact ionization processes which transfer energy and particles from the beam to the background plasma. Particle simulations of an RF-heated and a neutral-beam-heated simple-mirror plasma are presented. 8 refs., 5 figs

  12. The analysis of Alfven wave current drive and plasma heating in TCABR tokamak

    International Nuclear Information System (INIS)

    Ruchko, L.F.; Lerche, E.A.; Galvao, R.M.O.; Elfimov, A.G.; Nascimento, I.C.; Sa, W.P. de; Sanada, E.; Elizondo, J.I.; Ferreira, A.A.; Saettone, E.A.; Severo, J.H.F.; Bellintani, V.; Usuriaga, O.N.

    2002-01-01

    The results of experiments on Alfven wave current drive and plasma heating in the TCABR tokamak are analyzed with the help of a numerical code for simulation of the diffusion of the toroidal electric field. It permits to find radial distributions of plasma current density and conductivity, which match the experimentally measured total plasma current and loop voltage changes, and thus to study the performance of the RF system during Alfven wave plasma heating and current drive experiments. Regimes with efficient RF power input in TCABR have been analyzed and revealed the possibility of noninductive current generation with magnitudes up to ∼8 kA. The increase of plasma energy content due to RF power input is consistent with the diamagnetic measurements. (author)

  13. Chemical and physical reactions under thermal plasmas conditions

    International Nuclear Information System (INIS)

    Fauchais, P.; Vardelle, A.; Vardelle, M.; Coudert, J.F.

    1987-01-01

    Basic understanding of the involved phenomena lags far behind industrial development that requires now a better knowledge of the phenomena to achieve a better control of the process allowing to improve the quality of the products. Thus the authors try to precise what is their actual knowledge in the fields of: plasma generators design; plasma flow models with the following key points: laminar or turbulent flow, heat transfer to walls, 2D or 3D models, non equilibrium effects, mixing problems when chemical reactions are to be taken into account with very fast kinetics, electrode regions, data for transport properties and kinetic rates; nucleation problems; plasma flow characteristics measurements: temperature or temperatures and population of excited states (automatized emission spectroscopy, LIF, CARS) as well as flow velocity (LDA with small particles, Doppler effects...); plasma and particles momentum and heat transfer either with models taking into account particles size and injection velocity distributions, heat propagation, vaporization, Kundsen effect, turbulences ... or with measurements: particles velocity and flux distributions (Laser Anemometry) as well as surface temperature distributions (two colour pyrometry in flight statistical or not)

  14. RF generation in the DARHT Axis-II beam dump

    Energy Technology Data Exchange (ETDEWEB)

    Ekdahl, Carl A. Jr. [Los Alamos National Laboratory

    2012-05-03

    We have occasionally observed radio-frequency (RF) electromagnetic signals in the downstream transport (DST) of the second axis linear induction accelerator (LIA) at the dual-axis radiographic hydrodynamic testing (DARHT) facility. We have identified and eliminated some of the sources by eliminating the offending cavities. However, we still observe strong RF in the range 1 GHz t0 2 GHz occurring late in the {approx}2-{micro}s pulse that can be excited or prevented by varying the downstream tune. The narrow frequency width (<0.5%) and near exponential growth at the dominant frequency is indicative of a beam-cavity interaction, and electro-magnetic simulations of cavity structure show a spectrum rich in resonances in the observed frequency range. However, the source of beam produced RF in the cavity resonance frequency range has not been identified, and it has been the subject of much speculation, ranging from beam-plasma or beam-ion instabilities to unstable cavity coupling.

  15. Electron density and temperature in NIO1 RF source operated in oxygen and argon

    Science.gov (United States)

    Barbisan, M.; Zaniol, B.; Cavenago, M.; Pasqualotto, R.; Serianni, G.; Zanini, M.

    2017-08-01

    The NIO1 experiment, built and operated at Consorzio RFX, hosts an RF negative ion source, from which it is possible to produce a beam of maximum 130 mA in H- ions, accelerated up to 60 kV. For the preliminary tests of the extraction system the source has been operated in oxygen, whose high electronegativity allows to reach useful levels of extracted beam current. The efficiency of negative ions extraction is strongly influenced by the electron density and temperature close to the Plasma Grid, i.e. the grid of the acceleration system which faces the source. To support the tests, these parameters have been measured by means of the Optical Emission Spectroscopy diagnostic. This technique has involved the use of an oxygen-argon mixture to produce the plasma in the source. The intensities of specific Ar I and Ar II lines have been measured along lines of sight close to the Plasma Grid, and have been interpreted with the ADAS package to get the desired information. This work will describe the diagnostic hardware, the analysis method and the measured values of electron density and temperature, as function of the main source parameters (RF power, pressure, bias voltage and magnetic filter field). The main results show that not only electron density but also electron temperature increase with RF power; both decrease with increasing magnetic filter field. Variations of source pressure and plasma grid bias voltage appear to affect only electron temperature and electron density, respectively.

  16. Radio-frequency oxygen-plasma-enhanced pulsed laser deposition of IGZO films

    Directory of Open Access Journals (Sweden)

    Chia-Man Chou

    2017-07-01

    Full Text Available We demonstrate the crystalline structures, optical transmittance, surface and cross-sectional morphologies, chemical compositions, and electrical properties of indium gallium zinc oxide (IGZO-based thin films deposited on glass and silicon substrates through pulsed laser deposition (PLD incorporated with radio-frequency (r.f.-generated oxygen plasma. The plasma-enhanced pulsed laser deposition (PEPLD-based IGZO thin films exhibited a c-axis-aligned crystalline (CAAC structure, which was attributed to the increase in Zn-O under high oxygen vapor pressure (150 mTorr. High oxygen vapor pressure (150 mTorr and low r.f. power (10 W are the optimal deposition conditions for fabricating IGZO thin films with improved electrical properties.

  17. Vertically aligned Si nanocrystals embedded in amorphous Si matrix prepared by inductively coupled plasma chemical vapor deposition (ICP-CVD)

    Energy Technology Data Exchange (ETDEWEB)

    Nogay, G. [Department of Physics, Middle East Technical University (METU), Ankara 06800 (Turkey); Center of Solar Energy Research and Application (GÜNAM), Middle East Technical University (METU), Ankara 06800 (Turkey); Saleh, Z.M., E-mail: zaki.saleh@aauj.edu [Center of Solar Energy Research and Application (GÜNAM), Middle East Technical University (METU), Ankara 06800 (Turkey); Department of Physics, Arab American University–Jenin (AAUJ), Jenin, Palestine (Country Unknown); Özkol, E. [Center of Solar Energy Research and Application (GÜNAM), Middle East Technical University (METU), Ankara 06800 (Turkey); Department of Chemical Engineering, Middle East Technical University (METU), Ankara 06800 (Turkey); Turan, R. [Department of Physics, Middle East Technical University (METU), Ankara 06800 (Turkey); Center of Solar Energy Research and Application (GÜNAM), Middle East Technical University (METU), Ankara 06800 (Turkey)

    2015-06-15

    Highlights: • Inductively-coupled plasma is used for nanostructured silicon at room temperature. • Low temperature deposition allows device processing on various substrates. • Deposition pressure is the most effective parameter in controlling nanostructure. • Films consist of quantum dots in a-Si matrix and exhibit columnar vertical growth. • Films are porous to oxygen infusion along columnar grain boundaries. - Abstract: Vertically-aligned nanostructured silicon films are deposited at room temperature on p-type silicon wafers and glass substrates by inductively-coupled, plasma-enhanced chemical vapor deposition (ICPCVD). The nanocrystalline phase is achieved by reducing pressure and increasing RF power. The crystalline volume fraction (X{sub c}) and the size of the nanocrystals increase with decreasing pressure at constant power. Columnar growth of nc-Si:H films is observed by high resolution transmission electron microscopy (HRTEM) and scanning electron microscopy (SEM). The films exhibit cauliflower-like structures with high porosity that leads to slow but uniform oxidation after exposure to air at room temperature. Films deposited at low pressures exhibit photoluminescence (PL) signals that may be deconvoluted into three distinct Gaussian components: 760–810, 920–935, and 990–1000 nm attributable to the quantum confinement and interface defect states. Hydrogen dilution is manifested in significant enhancement of the PL, but it has little effect on the nanocrystal size and X{sub c}.

  18. Radio frequency conductivity of plasma in inhomogeneous magnetic field

    International Nuclear Information System (INIS)

    Itoh, Sanae; Nishikawa, Kyoji; Fukuyama, Atsushi; Itoh, Kimitaka.

    1985-01-01

    Nonlocal conductivity tensor is obtained to study the kinetic effects on propagation and absorption of radio frequency (rf) waves in dispersive plasmas. Generalized linear propagator in the presence of the inhomogeneity of magnetic field strength along the field line is calculated. The influence of the inhomogeneity to the rf wave-energy deposition is found to be appreciable. Application to toroidal plasmas is shown. (author)

  19. Chemical modeling of a high-density inductively-coupled plasma reactor containing silane

    NARCIS (Netherlands)

    Kovalgin, Alexeij Y.; Boogaard, A.; Brunets, I.; Holleman, J.; Schmitz, Jurriaan

    We carried out the modeling of chemical reactions in a silane-containing remote Inductively Coupled Plasma Enhanced Chemical Vapor Deposition (ICPECVD) system, intended for deposition of silicon, silicon oxide, and silicon nitride layers. The required electron densities and Electron Energy

  20. Chemical Changes in Nonthermal Plasma-Treated N-Acetylcysteine (NAC) Solution and Their Contribution to Bacterial Inactivation.

    Science.gov (United States)

    Ercan, Utku K; Smith, Josh; Ji, Hai-Feng; Brooks, Ari D; Joshi, Suresh G

    2016-02-02

    In continuation of our previous reports on the broad-spectrum antimicrobial activity of atmospheric non-thermal dielectric barrier discharge (DBD) plasma treated N-Acetylcysteine (NAC) solution against planktonic and biofilm forms of different multidrug resistant microorganisms, we present here the chemical changes that mediate inactivation of Escherichia coli. In this study, the mechanism and products of the chemical reactions in plasma-treated NAC solution are shown. UV-visible spectrometry, FT-IR, NMR, and colorimetric assays were utilized for chemical characterization of plasma treated NAC solution. The characterization results were correlated with the antimicrobial assays using determined chemical species in solution in order to confirm the major species that are responsible for antimicrobial inactivation. Our results have revealed that plasma treatment of NAC solution creates predominantly reactive nitrogen species versus reactive oxygen species, and the generated peroxynitrite is responsible for significant bacterial inactivation.

  1. RF BREAKDOWN STUDIES USING PRESSURIZED CAVITIES

    Energy Technology Data Exchange (ETDEWEB)

    Johnson, Rolland

    2014-09-21

    Many present and future particle accelerators are limited by the maximum electric gradient and peak surface fields that can be realized in RF cavities. Despite considerable effort, a comprehensive theory of RF breakdown has not been achieved and mitigation techniques to improve practical maximum accelerating gradients have had only limited success. Part of the problem is that RF breakdown in an evacuated cavity involves a complex mixture of effects, which include the geometry, metallurgy, and surface preparation of the accelerating structures and the make-up and pressure of the residual gas in which plasmas form. Studies showed that high gradients can be achieved quickly in 805 MHz RF cavities pressurized with dense hydrogen gas, as needed for muon cooling channels, without the need for long conditioning times, even in the presence of strong external magnetic fields. This positive result was expected because the dense gas can practically eliminate dark currents and multipacting. In this project we used this high pressure technique to suppress effects of residual vacuum and geometry that are found in evacuated cavities in order to isolate and study the role of the metallic surfaces in RF cavity breakdown as a function of magnetic field, frequency, and surface preparation. One of the interesting and useful outcomes of this project was the unanticipated collaborations with LANL and Fermilab that led to new insights as to the operation of evacuated normal-conducting RF cavities in high external magnetic fields. Other accomplishments included: (1) RF breakdown experiments to test the effects of SF6 dopant in H2 and He gases with Sn, Al, and Cu electrodes were carried out in an 805 MHz cavity and compared to calculations and computer simulations. The heavy corrosion caused by the SF6 components led to the suggestion that a small admixture of oxygen, instead of SF6, to the hydrogen would allow the same advantages without the corrosion in a practical muon beam line. (2) A

  2. Status of RF beryllium characterization for ITER Fist Wall

    Science.gov (United States)

    Kupriyanov, I. B.; Nikolaev, G. N.; Roedig, M.; Gervash, A. А.; Linke, I. J.; Kurbatova, L. A.; Perevalov, S. I.; Giniyatulin, R. N.

    2011-10-01

    The status of RF R&D activities in production and characterization of TGP-56FW beryllium grade is presented. The results of metallographic studies of microstructure and cracks morphology are reported for full-scale Be tiles (56 × 56 × 10 mm) subjected to VDE simulation tests in TSEFEY-M testing facility (VDE-10 MJ/m 2 during 0.1 s, 1 shot ) and following low cycle thermal fatigue tests (500 thermal cycles at 1.5 MW/m 2). First results of plasma disruption tests ( E = 1.2-5 MJ/m 2, 5 ms), which were obtained during the realization of Thermal Shock/VDE Qualification program of RF beryllium in JUDITH-1 facility, are also discussed.

  3. Status of RF beryllium characterization for ITER Fist Wall

    International Nuclear Information System (INIS)

    Kupriyanov, I.B.; Nikolaev, G.N.; Roedig, M.; Gervash, A.A.; Linke, I.J.; Kurbatova, L.A.; Perevalov, S.I.; Giniyatulin, R.N.

    2011-01-01

    The status of RF R and D activities in production and characterization of TGP-56FW beryllium grade is presented. The results of metallographic studies of microstructure and cracks morphology are reported for full-scale Be tiles (56 x 56 x 10 mm) subjected to VDE simulation tests in TSEFEY-M testing facility (VDE-10 MJ/m 2 during 0.1 s, 1 shot) and following low cycle thermal fatigue tests (500 thermal cycles at 1.5 MW/m 2 ). First results of plasma disruption tests (E = 1.2-5 MJ/m 2 , 5 ms), which were obtained during the realization of Thermal Shock/VDE Qualification program of RF beryllium in JUDITH-1 facility, are also discussed.

  4. Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma

    Science.gov (United States)

    Liu, Zecheng; Ishikawa, Kenji; Imamura, Masato; Tsutsumi, Takayoshi; Kondo, Hiroki; Oda, Osamu; Sekine, Makoto; Hori, Masaru

    2018-06-01

    Plasma-induced damage (PID) on GaN was optimally reduced by high-temperature chlorine plasma etching. Energetic ion bombardments primarily induced PID involving stoichiometry, surface roughness, and photoluminescence (PL) degradation. Chemical reactions under ultraviolet (UV) irradiation and chlorine radical exposure at temperatures higher than 400 °C can be controlled by taking into account the synergism of simultaneous photon and radical irradiations to effectively reduce PID.

  5. Quantitative chemical exchange saturation transfer (qCEST) MRI--RF spillover effect-corrected omega plot for simultaneous determination of labile proton fraction ratio and exchange rate.

    Science.gov (United States)

    Sun, Phillip Zhe; Wang, Yu; Dai, ZhuoZhi; Xiao, Gang; Wu, Renhua

    2014-01-01

    Chemical exchange saturation transfer (CEST) MRI is sensitive to dilute proteins and peptides as well as microenvironmental properties. However, the complexity of the CEST MRI effect, which varies with the labile proton content, exchange rate and experimental conditions, underscores the need for developing quantitative CEST (qCEST) analysis. Towards this goal, it has been shown that omega plot is capable of quantifying paramagnetic CEST MRI. However, the use of the omega plot is somewhat limited for diamagnetic CEST (DIACEST) MRI because it is more susceptible to direct radio frequency (RF) saturation (spillover) owing to the relatively small chemical shift. Recently, it has been found that, for dilute DIACEST agents that undergo slow to intermediate chemical exchange, the spillover effect varies little with the labile proton ratio and exchange rate. Therefore, we postulated that the omega plot analysis can be improved if RF spillover effect could be estimated and taken into account. Specifically, simulation showed that both labile proton ratio and exchange rate derived using the spillover effect-corrected omega plot were in good agreement with simulated values. In addition, the modified omega plot was confirmed experimentally, and we showed that the derived labile proton ratio increased linearly with creatine concentration (p plot for quantitative analysis of DIACEST MRI. Copyright © 2014 John Wiley & Sons, Ltd.

  6. ITO/InP solar cells: A comparison of devices fabricated by ion beam and RF sputtering of the ITO

    Science.gov (United States)

    Coutts, T. J.

    1987-01-01

    This work was performed with the view of elucidating the behavior of indium tin oxide/indium phosphide (ITO/InP) solar cells prepared by RF and ion beam sputtering. It was found that using RF sputter deposition of the ITO always leads to more efficient devices than ion beam sputter deposition. An important aspect of the former technique is the exposure of the single crystal p-InP substrates to a very low plasma power prior to deposition. Substrates treated in this manner have also been used for ion beam deposition of ITO. In this case the cells behave very similarly to the RF deposited cells, thus suggesting that the lower power plasma exposure (LPPE) is the crucial process step.

  7. Plasma processing of superconducting radio frequency cavities

    Science.gov (United States)

    Upadhyay, Janardan

    The development of plasma processing technology of superconducting radio frequency (SRF) cavities not only provides a chemical free and less expensive processing method, but also opens up the possibility for controlled modification of the inner surfaces of the cavity for better superconducting properties. The research was focused on the transition of plasma etching from two dimensional flat surfaces to inner surfaces of three dimensional (3D) structures. The results could be applicable to a variety of inner surfaces of 3D structures other than SRF cavities. Understanding the Ar/Cl2 plasma etching mechanism is crucial for achieving the desired modification of Nb SRF cavities. In the process of developing plasma etching technology, an apparatus was built and a method was developed to plasma etch a single cell Pill Box cavity. The plasma characterization was done with the help of optical emission spectroscopy. The Nb etch rate at various points of this cavity was measured before processing the SRF cavity. Cylindrical ring-type samples of Nb placed on the inner surface of the outer wall were used to measure the dependence of the process parameters on plasma etching. The measured etch rate dependence on the pressure, rf power, dc bias, temperature, Cl2 concentration and diameter of the inner electrode was determined. The etch rate mechanism was studied by varying the temperature of the outer wall, the dc bias on the inner electrode and gas conditions. In a coaxial plasma reactor, uniform plasma etching along the cylindrical structure is a challenging task due to depletion of the active radicals along the gas flow direction. The dependence of etch rate uniformity along the cylindrical axis was determined as a function of process parameters. The formation of dc self-biases due to surface area asymmetry in this type of plasma and its variation on the pressure, rf power and gas composition was measured. Enhancing the surface area of the inner electrode to reduce the

  8. A study of the potential of plasma processing in the chemical industry

    International Nuclear Information System (INIS)

    Estey, P.N.; Connolly, T.J.

    1984-01-01

    This work describes a systematic approach to determine the potential for plasma processing in the United States chemical industry. A model was developed that describes the physical inputs and outputs from a plasma based processing system. Based on these mass flows and the energy flows to the processor an economic assessment of the plasma processing system is made. This economic assessment which also includes the capital costs of the processor, can be used to determine if the plasma system is competitive with the conventional system

  9. Studies on omnidirectional enhancement of giga-hertz radiation by sub-wavelength plasma modulation

    Science.gov (United States)

    Fanrong, KONG; Qiuyue, NIE; Shu, LIN; Zhibin, WANG; Bowen, LI; Shulei, ZHENG; Binhao, JIANG

    2018-01-01

    The technology of radio frequency (RF) radiation intensification for radio compact antennas based on modulation and enhancement effects of sub-wavelength plasma structures represents an innovative developing strategy. It exhibits important scientific significance and promising potential of broad applications in various areas of national strategic demands, such as electrical information network and microwave communication, detection and control technology. In this paper, laboratory experiments and corresponding analyses have been carried out to investigate the modulation and enhancement technology of sub-wavelength plasma structure on the RF electromagnetic radiation. An application focused sub-wavelength plasma-added intensification up to ∼7 dB higher than the free-space radiation is observed experimentally in giga-hertz (GHz) RF band. The effective radiation enhancement bandwidth covers from 0.85 to 1.17 GHz, while the enhanced electromagnetic signals transmitted by sub-wavelength plasma structures maintain good communication quality. Particularly, differing from the traditional RF electromagnetic radiation enhancement method characterized by focusing the radiation field of antenna in a specific direction, the sub-wavelength plasma-added intensification of the antenna radiation presents an omnidirectional enhancement, which is reported experimentally for the first time. Corresponding performance characteristics and enhancement mechanism analyses are also conducted in this paper. The results have demonstrated the feasibility and promising potential of sub-wavelength plasma modulation in application focused RF communication, and provided the scientific basis for further research and development of sub-wavelength plasma enhanced compact antennas with wide-range requests and good quality for communication.

  10. Effects of high power ion Bernstein waves on a tokamak plasma