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Sample records for rf plasma assisted

  1. Direct visual observation of powder dynamics in RF plasma-assisted deposition

    International Nuclear Information System (INIS)

    Howling, A.A.; Hollenstein, C.; Paris, P.J.

    1991-04-01

    Contamination due to particles generated and suspended in silane rf plasmas is investigated. Powder is rendered visible by illumination of the reactor volume. This simple diagnostic for global, spatio-temporal powder dynamics is used to study particle formation, trapping and powder reduction by power modulation. (author) 4 figs., 11 refs

  2. Multilayered metal oxide thin film gas sensors obtained by conventional and RF plasma-assisted laser ablation

    International Nuclear Information System (INIS)

    Mitu, B.; Marotta, V.; Orlando, S.

    2006-01-01

    Multilayered thin films of In 2 O 3 and SnO 2 have been deposited by conventional and RF plasma-assisted reactive pulsed laser ablation, with the aim to evaluate their behaviour as toxic gas sensors. The depositions have been carried out by a frequency doubled Nd-YAG laser (λ = 532 nm, τ = 7 ns) on Si(1 0 0) substrates, in O 2 atmosphere. The thin films have been characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and electrical resistance measurements. A comparison of the electrical response of the simple (indium oxide, tin oxide) and multilayered oxides to toxic gas (nitric oxide, NO) has been performed. The influence on the structural and electrical properties of the deposition parameters, such as substrate temperature and RF power is reported

  3. Temperature dependence of InN film deposition by an RF plasma-assisted reactive ion beam sputtering deposition technique

    International Nuclear Information System (INIS)

    Shinoda, Hiroyuki; Mutsukura, Nobuki

    2005-01-01

    Indium nitride (InN) films were deposited on Si(100) substrates using a radiofrequency (RF) plasma-assisted reactive ion beam sputtering deposition technique at various substrate temperatures. The X-ray diffraction patterns of the InN films suggest that the InN films deposited at substrate temperatures up to 370 deg C were cubic crystalline InN; and at 500 deg C, the InN film was hexagonal crystalline InN. In a scanning electron microscope image of the InN film surface, facets of cubic single-crystalline InN grains were clearly observed on the InN film deposited at 370 deg C. The inclusion of metallic indium appeared on the InN film deposited at 500 deg C

  4. VO2 Thermochromic Films on Quartz Glass Substrate Grown by RF-Plasma-Assisted Oxide Molecular Beam Epitaxy

    Directory of Open Access Journals (Sweden)

    Dong Zhang

    2017-03-01

    Full Text Available Vanadium dioxide (VO2 thermochromic thin films with various thicknesses were grown on quartz glass substrates by radio frequency (RF-plasma assisted oxide molecular beam epitaxy (O-MBE. The crystal structure, morphology and chemical stoichiometry were investigated systemically by X-ray diffraction (XRD, atomic force microscopy (AFM, Raman spectroscopy and X-ray photoelectron spectroscopy (XPS analyses. An excellent reversible metal-to-insulator transition (MIT characteristics accompanied by an abrupt change in both electrical resistivity and optical infrared (IR transmittance was observed from the optimized sample. Remarkably, the transition temperature (TMIT deduced from the resistivity-temperature curve was reasonably consistent with that obtained from the temperature-dependent IR transmittance. Based on Raman measurement and XPS analyses, the observations were interpreted in terms of residual stresses and chemical stoichiometry. This achievement will be of great benefit for practical application of VO2-based smart windows.

  5. Vortex formation during rf heating of plasma

    International Nuclear Information System (INIS)

    Motley, R.W.

    1980-05-01

    Experiments on a test plasma show that the linear theory of waveguide coupling to slow plasma waves begins to break down if the rf power flux exceeds approx. 30 W/cm 2 . Probe measurements reveal that within 30 μs an undulation appears in the surface plasma near the mouth of the twin waveguide. This surface readjustment is part of a vortex, or off-center convective cell, driven by asymmetric rf heating of the plasma column

  6. Plasma edge cooling during RF heating

    International Nuclear Information System (INIS)

    Suckewer, S.; Hawryluk, R.J.

    1978-01-01

    A new approach to prevent the influx of high-Z impurities into the core of a tokamak discharge by using RF power to modify the edge plasma temperature profile is presented. This concept is based on spectroscopic measurements on PLT during ohmic heating and ATC during RF heating. A one dimensional impurity transport model is used to interpret the ATC results

  7. DC plasma ion implantation in an inductively coupled RF plasma

    International Nuclear Information System (INIS)

    Silawatshananai, C.; Matan, N.; Pakpum, C.; Pussadee, N.; Srisantitam, P.; Davynov, S.; Vilaithong, T.

    2004-01-01

    Various modes of plasma ion implantation have been investigated in a small inductively coupled 13.6 MHz RF plasma source. Plasma ion implantation with HVDC(up to -10 kV bias) has been investigated in order to incorporate with the conventional implantation of diamond like carbon. In this preliminary work, nitrogen ions are implanted into the stainless steel sample with a dose of 5.5 x 10 -2 cm for a short implanting time of 7 minutes without target cooling. Surface properties such as microhardness, wear rate and the friction coefficient have been improved. X-ray and SEM analyses show distinct structural changes on the surface. A combination of sheath assisted implantation and thermal diffusion may be responsible for improvement in surface properties. (orig.)

  8. RF and microwave diagnostics of plasma

    International Nuclear Information System (INIS)

    Basu, J.

    1976-01-01

    A brief review of RF and microwave investigations carried out at laboratory plasma is presented. Both the immersive and non-immersive RF probes of various types are discussed, the major emphasis being laid on the work carried out in extending the scope of the immersive impedance probe and non-immersive coil probe. The standard microwave methods for plasma diagnosis are mentioned. The role of relatively new diagnostic tool, viz., a dielectric-rod waveguide, is described, and the technique of measuring the admittance of such a waveguide (or an antenna) enveloped in plasma is discussed. (K.B.)

  9. RF Electron Gun with Driven Plasma Cathode

    CERN Document Server

    Khodak, Igor

    2005-01-01

    It's known that RF guns with plasma cathodes based on solid-state dielectrics are able to generate an intense electron beam. In this paper we describe results of experimental investigation of the single cavity S-band RF gun with driven plasma cathode. The experimental sample of the cathode based on ferroelectric ceramics has been designed. Special design of the cathode permits to separate spatially processes of plasma development and electron acceleration. It has been obtained at RF gun output electron beam with particle energy ~500 keV, pulse current of 4 A and pulse duration of 80 ns. Results of experimental study of beam parameters are referred in. The gun is purposed to be applied as the intense electron beam source for electron linacs.

  10. Modelling of an RF plasma shower

    NARCIS (Netherlands)

    Atanasova, M.; Carbone, E.A.D.; Mihailova, D.B.; Benova, E.; Degrez, G.; Mullen, van der J.J.A.M.

    2012-01-01

    A capacitive radiofrequency (RF) discharge at atmospheric pressure is studied by means of a time-dependent, two-dimensional fluid model. The plasma is created in a stationary argon gas flow guided through two perforated electrodes, hence resembling a shower. The inner electrode, the electrode facing

  11. Rf-biasing of highly idealized plasmas

    NARCIS (Netherlands)

    Westermann, R.H.J.; Blauw, M.A.; Goedheer, W.J.; Sanden, van de M.C.M.; Schmidt, J.; Simek, M.; Pekarek, S.; Prukner, V.

    2007-01-01

    Remote plasmas, which are subjected to a radio-frequency (RF) biased surface, have been investigated theoretically and experimentally for decades. The relation between the complex power (DC) voltage characteristics, the ion energy distribution and control losses of the ion bombardment are of

  12. Conductivity of rf-heated plasma

    International Nuclear Information System (INIS)

    Fisch, N.J.

    1984-05-01

    The electron velocity distribution of rf-heated plasma may be so far from Maxwellian that Spitzer conductivity no longer holds. A new conductivity for such plasmas is derived and the result can be put in a remarkably general form. The new expression should be of great practical value in examining schemes for current ramp-up in tokamaks by means of lower-hybrid or other waves

  13. Equiintensities of RF plasma discharges

    International Nuclear Information System (INIS)

    Vaculik, R.; Brablec, A.; Kapicka, V.; St'astny, F.

    1998-01-01

    The presented diagnostic tool can provide information of temperature distribution in the plasma. The main advantage of the method is relatively simple, low cost and quick procedure. On the other hand the individual isoline corresponds to some mean values for the wide bandwidth of interference filter. However, in real plasma sources is usually difficult to find isolated intensive line which is characterized by excitation temperature. Nevertheless, we believe that application is useful and fulfills other diagnostics methods. The visualisation of temperature field can help to understand conditions in plasmas and processes occurring there. However, the fast procedure (in real time) will be useful only. It has to be done during each experiment and carefully coupled with other diagnostic methods. It means that the device must be the low cost one. (author)

  14. RF current drive and plasma fluctuations

    International Nuclear Information System (INIS)

    Peysson, Yves; Decker, Joan; Morini, L; Coda, S

    2011-01-01

    The role played by electron density fluctuations near the plasma edge on rf current drive in tokamaks is assessed quantitatively. For this purpose, a general framework for incorporating density fluctuations in existing modelling tools has been developed. It is valid when rf power absorption takes place far from the fluctuating region of the plasma. The ray-tracing formalism is modified in order to take into account time-dependent perturbations of the density, while the Fokker–Planck solver remains unchanged. The evolution of the electron distribution function in time and space under the competing effects of collisions and quasilinear diffusion by rf waves is determined consistently with the time scale of fluctuations described as a statistical process. Using the ray-tracing code C3PO and the 3D linearized relativistic bounce-averaged Fokker–Planck solver LUKE, the effect of electron density fluctuations on the current driven by the lower hybrid (LH) and the electron cyclotron (EC) waves is estimated quantitatively. A thin fluctuating layer characterized by electron drift wave turbulence at the plasma edge is considered. The effect of fluctuations on the LH wave propagation is equivalent to a random scattering process with a broadening of the poloidal mode spectrum proportional to the level of the perturbation. However, in the multipass regime, the LH current density profile remains sensitive to the ray chaotic behaviour, which is not averaged by fluctuations. The effect of large amplitude fluctuations on the EC driven current is found to be similar to an anomalous radial transport of the fast electrons. The resulting lower current drive efficiency and broader current profile are in better agreement with experimental observations. Finally, applied to the ITER ELMy H-mode regime, the model predicts a significant broadening of the EC driven current density profile with the fluctuation level, which can make the stabilization of neoclassical tearing mode potentially

  15. Lage-area planar RF plasma productions by surface waves

    International Nuclear Information System (INIS)

    Nonaka, S.

    1994-01-01

    Large-area rf plasmas are confirmed to be produced by means of RF discharges inside a large-area dielectric tube. The plasma space is 73 cm x 176 cm and 2.5 cm. The plasma is thought to be produced by an odd plasma-surface wave (PSW ο ) in case of using large-area electrodes and by an even plasma-surface wave (PSW ο ) in case of without the electrodes. (author). 7 refs, 4 figs

  16. Effect of organic-buffer-layer on electrical property and environmental reliability of Ga-doped ZnO films prepared by RF plasma assisted DC magnetron sputtering on plastic substrate

    International Nuclear Information System (INIS)

    Hinoki, Toshio; Kyuhara, Chika; Agura, Hideaki; Yazawa, Kenji; Kinoshita, Kentaro; Ohmi, Koutoku; Kishida, Satoru

    2010-01-01

    Ga-doped ZnO (GZO) transparent conductive films have been prepared by RF plasma assisted DC magnetron sputtering under a reductive atmosphere on organic-buffer-layer (OBL) coated polyethylene telephthalate (PET) substrates without intentionally heating substrates. Electrical and optical properties, crystallinity, and environmental reliability of the GZO films have been investigated. The distributional characteristic of resistivity is observed in the GZO film deposited on the OBL-coated PET substrates. The high resistivity at facing the erosion area in the source target is reduced by providing the RF plasma and H 2 gas near the substrate, resulting in a uniform distribution of the sheet resistance. It has been also found that the increase of resistivity by an accelerated aging test performed under a storage condition at 60 o C and at a relative humidity of 95% is suppressed by employing the OBL. The OBL suppresses the formation of cracks, which are induced by the aging test. These facts are thought to contribute to a high environmental reliability of GZO films on PET substrates. Values of resistivity, Hall mobility and carrier concentration are obtained: 5.0-20 x 10 -3 Ω cm, 4.0 cm 2 /Vs, and 3.8 x 10 20 cm -3 , respectively. An average transmittance of the GZO film including OBL and PET substrate is 78% in a visible region. The OBL enables to realize the practical use of GZO films on PET sheets.

  17. Titanium oxidation by rf inductively coupled plasma

    International Nuclear Information System (INIS)

    Valencia-Alvarado, R; López-Callejas, R; Barocio, S R; Mercado-Cabrera, A; Peña-Eguiluz, R; Muñoz-Castro, A E; Rodríguez-Méndez, B G; De la Piedad-Beneitez, A; De la Rosa-Vázquez, J M

    2014-01-01

    The development of titanium dioxide (TiO 2 ) films in the rutile and anatase phases is reported. The films have been obtained from an implantation/diffusion and sputtering process of commercially pure titanium targets, carried out in up to 500 W plasmas. The experimental outcome is of particular interest, in the case of anatase, for atmospheric pollution degradation by photocatalysis and, as to the rutile phase, for the production of biomaterials required by prosthesis and implants. The reactor employed consists in a cylindrical pyrex-like glass vessel inductively coupled to a 13.56 MHz RF source. The process takes place at a 5×10 −2 mbar pressure with the target samples being biased from 0 to -3000 V DC. The anatase phase films were obtained from sputtering the titanium targets over glass and silicon electrically floated substrates placed 2 cm away from the target. The rutile phase was obtained by implantation/diffusion on targets at about 700 °C. The plasma was developed from a 4:1 argon/oxygen mixture for ∼5 hour processing periods. The target temperature was controlled by means of the bias voltage and the plasma source power. The obtained anatase phases did not require annealing after the plasma oxidation process. The characterization of the film samples was conducted by means of x-ray diffraction, scanning electron microscopy, x-ray photoelectron spectroscopy and Raman spectroscopy

  18. m-plane GaN layers grown by rf-plasma assisted molecular beam epitaxy with varying Ga/N flux ratios on m-plane 4H-SiC substrates

    International Nuclear Information System (INIS)

    Armitage, R.; Horita, M.; Suda, J.; Kimoto, T.

    2007-01-01

    A series of m-plane GaN layers with the Ga beam-equivalent pressure (BEP) as the only varied parameter was grown by rf-plasma assisted molecular beam epitaxy on m-plane 4H-SiC substrates using AlN buffer layers. The smoothest growth surfaces and most complete film coalescence were found for the highest Ga BEP corresponding to the Ga droplet accumulation regime. However, better structural quality as assessed by x-ray rocking curves was observed for growth at a lower Ga BEP value below the droplet limit. The variation of rocking curve widths for planes inclined with respect to the epilayer c axis followed a different trend with Ga BEP than those of reflections parallel to the c axis. The GaN layers were found to exhibit a large residual compressive strain along the a axis

  19. RF induction plasma spheroidization of tungsten powders

    International Nuclear Information System (INIS)

    Gu Zhogntao; Ye Gaoying; Liu Chuandong; Tong Honghui

    2009-01-01

    Irregularly-shaped tungsten powders (average granular sizes of 512 μm) have been spheroidized by radio frequency (RF)induction plasma. The effects of feed rate, mode of material dispersion, particle size on spheroidization efficiency are investigated. Experimental results show that the spheroidization efficiency decreases rapidly when the feed rate increases to more than 95 g/min. Only 30% spheroidization efficiency is gained at the feed rate of 135.75 g/min. The spheroidization efficiency is also affected by the flow rate of carrier gas. When the flow rate of carrier gas is 0.12 m 3 /h, the dispersion effect is the best, and the spheroidization efficiency is almost 100%. The apparent density of tungsten powders increases a bit with the increase of spheroidization efficiency. And the particle size uniformity of spheroidized tungsten powders is in accordance with that of original powders. (authors)

  20. Effects of an RF limiter on TEXTOR's edge plasmas

    International Nuclear Information System (INIS)

    Boedo, J.A.; Sakawa, Y.; Gray, D.S.; Mank, G.; Noda, N.

    1997-01-01

    Studies directed towards the reduction of particle and heat fluxes to plasma facing components by the application of ponderomotive forces generated by radio frequency (RF) are being conducted in TEXTOR. A modified poloidal limiter is used as an antenna with up to 3 kW of RF power; the data obtained show that the plasma is repelled by the RF ponderomotive potential. The density is reduced by a factor of 2-4 and the radial decay length is substantially altered. The density near the limiter decays exponentially with RF power. The electron temperature profile changes, with the decay length becoming longer (almost flat) during the RF. The temperature in the scrape off layer (SOL) increases and its increase is roughly proportional to the RF power until it saturates, suggesting that the heating efficiency drops with power, and that improved performance is to be expected at higher powers. (orig.)

  1. Characteristic performance of radio-frequency(RF) plasma heating using inverter RF power supplies

    International Nuclear Information System (INIS)

    Imai, Takahiro; Uesugi, Yoshihiko; Takamura, Shuichi; Sawada, Hiroyuki; Hattori, Norifumi

    2000-01-01

    High heat flux plasma are produced by high powe (∼14 kW) ICRF heating using inverter power supplies in the linear divertor simulator NAGDIS-II. The power flow of radiated rf power is investigated by a calorimetric method. Conventional power calculation using antenna voltage and current gives that about 70% of the rf power is radiated into the plasma. But increase of the heat load at the target and anode is about 10% of the rf power. Through this experiment, we find that about half of the rf power is lost at the antenna surface through the formation of rf induced sheath. And about 30% of the power is lost into the vacuum vessel through the charge exchange and elastic collision of ions with neutrals. (author)

  2. RF assisted switching in magnetic Josephson junctions

    Science.gov (United States)

    Caruso, R.; Massarotti, D.; Bolginov, V. V.; Ben Hamida, A.; Karelina, L. N.; Miano, A.; Vernik, I. V.; Tafuri, F.; Ryazanov, V. V.; Mukhanov, O. A.; Pepe, G. P.

    2018-04-01

    We test the effect of an external RF field on the switching processes of magnetic Josephson junctions (MJJs) suitable for the realization of fast, scalable cryogenic memories compatible with Single Flux Quantum logic. We show that the combined application of microwaves and magnetic field pulses can improve the performances of the device, increasing the separation between the critical current levels corresponding to logical "0" and "1." The enhancement of the current level separation can be as high as 80% using an optimal set of parameters. We demonstrate that external RF fields can be used as an additional tool to manipulate the memory states, and we expect that this approach may lead to the development of new methods of selecting MJJs and manipulating their states in memory arrays for various applications.

  3. On the distribution of plasma parameters in RF glow discharge

    International Nuclear Information System (INIS)

    Ning Cheng; Liu Zuli; Liu Donghui; Han Caiyuan.

    1993-01-01

    A self-consistent numerical model based on the two-fluid equations for describing the transport of charged particles in the RF glow discharge is presented. For a plasma generator filled with low-pressure air and parallel-plate electrodes, the model is numerical solved. The space-time distribution of parameters and the spatial distribution of some time-averaged parameters in plasma, which show the physical picture of the RF glow discharge, are obtained

  4. The investigation of Al0.29Ga0.71N/GaN/AlN and AlN/GaN/AlN thin films grown on Si (111) by RF plasma-assisted MBE

    Science.gov (United States)

    Yusoff, Mohd Zaki Mohd; Mahyuddin, Azzafeerah; Hassan, Zainuriah; Hassan, Haslan Abu; Abdullah, Mat Johar

    2012-06-01

    Recently, gallium nitride (GaN) and its related compounds involving Al and In have attracted much attention because of their potential to be used as high-efficiency UV light emitting devices, and as high frequency and high power electronic devices. Consequently, the growth and physics of GaN-based materials have attracted remarkable scientific attention. In this work, the growth and characterization of epitaxial Al0.29Ga0.71N and AlN layers grown on Si (111) by RF-plasma assisted molecular beam epitaxy (MBE) are described. The Al mole fraction was derived from the HR-XRD symmetric rocking curve (RC) ω/2θ scans of (0002) plane as x = 0.29. For AlN/GaN/AlN sample, the maximum Raman intensity at 521.53 cm-1 is attributed to crystalline silicon. It was found that the allowed Raman optical phonon mode of GaN, the E1 (high) is clearly visible, which is located at 570.74 cm-1. Photoluminscence (PL) spectrums of both samples have shown sharp and intense band edge emission of GaN without the existence of yellow emission band, showing good crystal quality of the samples have been successfully grown on Si substrate.

  5. Microparticles in a RF plasma under hyper gravity conditions

    NARCIS (Netherlands)

    Beckers, J.; Stoffels, W.W.; Ockenga, T.; Wolter, M.; Kersten, H.

    2009-01-01

    Summary form only given: For diagnostic purposes micrometer-sized particles can be used as floating electrostatic probes. Once injected into a complex rf plasma, these particles will become negatively charged and can be trapped in the plasma sheath due to an equilibrium of several forces working on

  6. RF-Plasma Source Commissioning in Indian Negative Ion Facility

    International Nuclear Information System (INIS)

    Singh, M. J.; Bandyopadhyay, M.; Yadava, Ratnakar; Chakraborty, A. K.; Bansal, G.; Gahlaut, A.; Soni, J.; Kumar, Sunil; Pandya, K.; Parmar, K. G.; Sonara, J.; Kraus, W.; Heinemann, B.; Riedl, R.; Obermayer, S.; Martens, C.; Franzen, P.; Fantz, U.

    2011-01-01

    The Indian program of the RF based negative ion source has started off with the commissioning of ROBIN, the inductively coupled RF based negative ion source facility under establishment at Institute for Plasma research (IPR), India. The facility is being developed under a technology transfer agreement with IPP Garching. It consists of a single RF driver based beam source (BATMAN replica) coupled to a 100 kW, 1 MHz RF generator with a self excited oscillator, through a matching network, for plasma production and ion extraction and acceleration. The delivery of the RF generator and the RF plasma source without the accelerator, has enabled initiation of plasma production experiments. The recent experimental campaign has established the matching circuit parameters that result in plasma production with density in the range of 0.5-1x10 18 /m 3 , at operational gas pressures ranging between 0.4-1 Pa. Various configurations of the matching network have been experimented upon to obtain a stable operation of the set up for RF powers ranging between 25-85 kW and pulse lengths ranging between 4-20 s. It has been observed that the range of the parameters of the matching circuit, over which the frequency of the power supply is stable, is narrow and further experiments with increased number of turns in the coil are in the pipeline to see if the range can be widened. In this paper, the description of the experimental system and the commissioning data related to the optimisation of the various parameters of the matching network, to obtain stable plasma of required density, are presented and discussed.

  7. RF-Plasma Source Commissioning in Indian Negative Ion Facility

    Science.gov (United States)

    Singh, M. J.; Bandyopadhyay, M.; Bansal, G.; Gahlaut, A.; Soni, J.; Kumar, Sunil; Pandya, K.; Parmar, K. G.; Sonara, J.; Yadava, Ratnakar; Chakraborty, A. K.; Kraus, W.; Heinemann, B.; Riedl, R.; Obermayer, S.; Martens, C.; Franzen, P.; Fantz, U.

    2011-09-01

    The Indian program of the RF based negative ion source has started off with the commissioning of ROBIN, the inductively coupled RF based negative ion source facility under establishment at Institute for Plasma research (IPR), India. The facility is being developed under a technology transfer agreement with IPP Garching. It consists of a single RF driver based beam source (BATMAN replica) coupled to a 100 kW, 1 MHz RF generator with a self excited oscillator, through a matching network, for plasma production and ion extraction and acceleration. The delivery of the RF generator and the RF plasma source without the accelerator, has enabled initiation of plasma production experiments. The recent experimental campaign has established the matching circuit parameters that result in plasma production with density in the range of 0.5-1×1018/m3, at operational gas pressures ranging between 0.4-1 Pa. Various configurations of the matching network have been experimented upon to obtain a stable operation of the set up for RF powers ranging between 25-85 kW and pulse lengths ranging between 4-20 s. It has been observed that the range of the parameters of the matching circuit, over which the frequency of the power supply is stable, is narrow and further experiments with increased number of turns in the coil are in the pipeline to see if the range can be widened. In this paper, the description of the experimental system and the commissioning data related to the optimisation of the various parameters of the matching network, to obtain stable plasma of required density, are presented and discussed.

  8. Plasma rotation and rf heating in DIII-D

    International Nuclear Information System (INIS)

    DeGrassie, J.S.; Baker, D.R.; Burrell, K.H.

    1999-05-01

    In a variety of discharge conditions on DIII-D it is observed that rf electron heating reduces the toroidal rotation speed and core ion temperature. The rf heating can be with either fast wave or electron cyclotron heating and this effect is insensitive to the details of the launched toroidal wavenumber spectrum. To date all target discharges have rotation first established with co-directed neutral beam injection. A possible cause is enhanced ion momentum and thermal diffusivity due to electron heating effectively creating greater anomalous viscosity. Another is that a counter directed toroidal force is applied to the bulk plasma via rf driven radial current

  9. Plasma rotation and rf heating in DIII-D

    International Nuclear Information System (INIS)

    Grassie, J. S. de; Baker, D. R.; Burrell, K. H.; Greenfield, C. M.; Lin-Liu, Y. R.; Luce, T. C.; Petty, C. C.; Prater, R.; Heidbrink, W. W.; Rice, B. W.

    1999-01-01

    In a variety of discharge conditions on DIII-D it is observed that rf electron heating reduces the toroidal rotation speed and core ion temperature. The rf heating can be with either fast wave or electron cyclotron heating and this effect is insensitive to the details of the launched toroidal wavenumber spectrum. To date all target discharges have rotation first established with co-directed neutral beam injection. A possible cause is enhanced ion momentum and thermal diffusivity due to electron heating effectively creating greater anomalous viscosity. Another is that a counter directed toroidal force is applied to the bulk plasma via rf driven radial current. (c) 1999 American Institute of Physics

  10. Plasma Sprayed Coatings for RF Wave Absorption

    Czech Academy of Sciences Publication Activity Database

    Nanobashvili, S.; Matějíček, Jiří; Žáček, František; Stöckel, Jan; Chráska, Pavel; Brožek, Vlastimil

    307-311, - (2002), s. 1334-1338 ISSN 0022-3115 Grant - others: COST (XE) Euratom DV4/04(TWO) Institutional research plan: CEZ:AV0Z2043910 Keywords : boron carbide, thermal spray coatings, fusion materials, RF wave absorption Subject RIV: JK - Corrosion ; Surface Treatment of Materials Impact factor: 1.730, year: 2002

  11. Inductive current startup in large tokamaks with expanding minor radius and RF assist

    International Nuclear Information System (INIS)

    Borowski, S.K.

    1983-01-01

    Auxiliary RF heating of electrons before and during the current rise phase of a large tokamak, such as the Fusion Engineering Device, is examined as a means of reducing both the initiation loop voltage and resistive flux expenditure during startup. Prior to current initiation, 1 to 2 MW of electron cyclotron resonance heating power at approx.90 GHz is used to create a small volume of high conductivity plasma (T/sub e/ approx. = 100 eV, n/sub e/ approx. = 10 19 m -3 ) near the upper hybrid resonance (UHR) region. This plasma conditioning permits a small radius (a 0 approx.< 0.4 m) current channel to be established with a relatively low initial loop voltage (approx.< 25 V as opposed to approx.100 V without RF assist). During the subsequent plasma expansion and current ramp phase, additional RF power is introduced to reduce volt-second consumption due to plasma resistance. To study the preheating phase, a near classical particle and energy transport model is developed to estimate the electron heating efficiency in a currentless toroidal plasma. The model assumes that preferential electron heating at the UHR leads to the formation of an ambipolar sheath potential between the neutral plasma and the conducting vacuum vessel and limiter

  12. Revisiting the Anomalous rf Field Penetration into a Warm Plasma

    International Nuclear Information System (INIS)

    Kaganovich, Igor D.; Polomarov, Oleg V.; Theodosiou, Constantine E.

    2005-01-01

    Radio-frequency [rf] waves do not penetrate into a plasma and are damped within it. The electric field of the wave and plasma current are concentrated near the plasma boundary in a skin layer. Electrons can transport the plasma current away from the skin layer due to their thermal motion. As a result, the width of the skin layer increases when electron temperature effects are taken into account. This phenomenon is called anomalous skin effect. The anomalous penetration of the rf electric field occurs not only for transversely propagating to the plasma boundary wave (inductively coupled plasmas) but also for the wave propagating along the plasma boundary (capacitively coupled plasmas). Such anomalous penetration of the rf field modifies the structure of the capacitive sheath. Recent advances in the nonlinear, non-local theory of the capacitive sheath are reported. It is shown that separating the electric field profile into exponential and non-exponential parts yields an efficient qualitative and quantitative description of the anomalous skin effect in both inductively and capacitively coupled plasma

  13. Effects of assistant anode on planar inductively coupled magnetized argon plasma in plasma immersion ion implantation

    International Nuclear Information System (INIS)

    Tang, Deli; Chu, Paul K.

    2003-01-01

    The enhancement of planar radio frequency (RF) inductively coupled argon plasma is studied in the presence of an assistant anode and an external magnetic field at low pressure. The influence of the assistant anode and magnetic field on the efficiency of RF power absorption and plasma parameters is investigated. An external axial magnetic field is coupled into the plasma discharge region by an external electromagnetic coil outside the discharge chamber and an assistant cylindrical anode is inserted into the discharge chamber to enhance the plasma discharge. The plasma parameters and density profile are measured by an electrostatic Langmuir probe at different magnetic fields and anode voltages. The RF power absorption by the plasma can be effectively enhanced by the external magnetic field compared with the nonmagnetized discharge. The plasma density can be further increased by the application of a voltage to the assistant anode. Owing to the effective power absorption and enhanced plasma discharge by the assistant anode in a longitudinal magnetic field, the plasma density can be enhanced by more than a factor of two. Meanwhile, the nonuniformity of the plasma density is less than 10% and it can be achieved in a process chamber with a diameter of 600 mm

  14. Modelling RF-plasma interaction in ECR ion sources

    Directory of Open Access Journals (Sweden)

    Mascali David

    2017-01-01

    Full Text Available This paper describes three-dimensional self-consistent numerical simulations of wave propagation in magnetoplasmas of Electron cyclotron resonance ion sources (ECRIS. Numerical results can give useful information on the distribution of the absorbed RF power and/or efficiency of RF heating, especially in the case of alternative schemes such as mode-conversion based heating scenarios. Ray-tracing approximation is allowed only for small wavelength compared to the system scale lengths: as a consequence, full-wave solutions of Maxwell-Vlasov equation must be taken into account in compact and strongly inhomogeneous ECRIS plasmas. This contribution presents a multi-scale temporal domains approach for simultaneously including RF dynamics and plasma kinetics in a “cold-plasma”, and some perspectives for “hot-plasma” implementation. The presented results rely with the attempt to establish a modal-conversion scenario of OXB-type in double frequency heating inside an ECRIS testbench.

  15. Comparative Analysis of Carbon Plasma in Arc and RF Reactors

    International Nuclear Information System (INIS)

    Todorovic-Markovic, B.; Markovic, Z.; Mohai, I.; Szepvolgyi, J.

    2004-01-01

    Results on studies of molecular spectra emitted in the initial stages of fullerene formation during the processing of graphite powder in induction RF reactor and evaporation of graphite electrodes in arc reactor are presented in this paper. It was found that C2 radicals were dominant molecular species in both plasmas. C2 radicals have an important role in the process of fullerene synthesis. The rotational-vibrational temperatures of C2 and CN species were calculated by fitting the experimental spectra to the simulated ones. The results of optical emission study of C2 radicals generated in carbon arc plasma have shown that rotational temperature of C2 species depends on carbon concentration and current intensity significantly. The optical emission study of induction RF plasma and SEM analysis of graphite powder before and after plasma treatment have shown that evaporation of the processed graphite powder depends on feed rate and composition of gas phase significantly. Based on the obtained results, it was concluded that in the plasma region CN radicals could be formed by the reaction of C2 species with atomic nitrogen at smaller loads. At larger feed rate of graphite powder, CN species were produced by surface reaction of the hot carbon particles with nitrogen atoms. The presence of nitrogen in induction RF plasma reduces the fullerene yield significantly. The fullerene yield obtained in two different reactors was: 13% in arc reactor and 4.1% in induction RF reactor. However, the fullerene production rate was higher in induction RF reactor-6.4 g/h versus 1.7 g/h in arc reactor

  16. Process for titanium powders spheroidization by RF induction plasma

    International Nuclear Information System (INIS)

    Gu Zhongtao; Ye Gaoying; Liu Chuandong; Tong Honghui

    2010-01-01

    Spherical titanium (Ti) particles were obtained by the process of heating irregularly shaped Ti powders under the radio frequency induction plasma (RF induction plasma) condition. The effect of feed rate, various dispersion methods and Ti particle size on the spheroidization efficiency was studied. The efficiency of the spheroidization is evaluated through the measurements of the percentage of powder spheroidized based on the electron microscopic observations and the tap density measurement of the processed powder. During the short flight of the particles in the plasma flow, of the order of a few milliseconds, the individual titanium particles of the powder are heated and melt, forming a spherical liquid droplet which upon freezing gives rise to the formation of a perfectly dense spherical solid particle. So RF induction plasma is a promising method for the preparation of spherical titanium powders with high flow ability. (authors)

  17. RF Plasma modeling of the Linac4 H− ion source

    CERN Document Server

    Mattei, S; Hatayama, A; Lettry, J; Kawamura, Y; Yasumoto, M; Schmitzer, C

    2013-01-01

    This study focuses on the modelling of the ICP RF-plasma in the Linac4 H− ion source currently being constructed at CERN. A self-consistent model of the plasma dynamics with the RF electromagnetic field has been developed by a PIC-MCC method. In this paper, the model is applied to the analysis of a low density plasma discharge initiation, with particular interest on the effect of the external magnetic field on the plasma properties, such as wall loss, electron density and electron energy. The use of a multi-cusp magnetic field effectively limits the wall losses, particularly in the radial direction. Preliminary results however indicate that a reduced heating efficiency results in such a configuration. The effect is possibly due to trapping of electrons in the multi-cusp magnetic field, preventing their continuous acceleration in the azimuthal direction.

  18. Comparative studies of chemically synthesized and RF plasma ...

    Indian Academy of Sciences (India)

    journal of. April 2015 physics pp. 653–665. Comparative studies of ... MS received 16 April 2013; revised 5 February 2014; accepted 28 May 2014 ... RF plasma polymerization; poly(o-toluidine); Fourier transform infrared; UV–visible ... tial applications, e.g., as electrodes and membranes for electrochemical energy ...

  19. Transition of RF internal antenna plasma by gas control

    Energy Technology Data Exchange (ETDEWEB)

    Hamajima, Takafumi; Yamauchi, Toshihiko; Kobayashi, Seiji; Hiruta, Toshihito; Kanno, Yoshinori [Advanced Institute of Industrial Technology, 1-10-40 HigashiOhi, Shinagawa-ku, Tokyo, 140-0011 (Japan); Japan Atomic Energy Agency, 2-4 Tokai-mura, Naka-gun, Ibaraki-ken, 319-1195 (Japan)

    2012-07-11

    The transition between the capacitively coupled plasma (CCP) and the inductively coupled plasma (ICP) was investigated with the internal radio frequency (RF) multi-turn antenna. The transition between them showed the hysteresis curve. The radiation power and the period of the self-pulse mode became small in proportion to the gas pressure. It was found that the ICP transition occurred by decreasing the gas pressure from 400 Pa.

  20. Sputter deposition of tantalum-nitride films on copper using an rf-plasma

    International Nuclear Information System (INIS)

    Walter, K.C.; Fetherston, R.P.; Sridharan, K.; Chen, A.; Shamim, M.M.; Conrad, J.R.

    1994-01-01

    A tantalum-nitride film was successfully deposited at ambient temperature on copper with a modified ion-assisted-deposition (IAD) technique. The process uses an argon and nitrogen plasma to sputter deposit from a tantalum rf-cathode and ion implant the deposited film simultaneously. Both argon and nitrogen ions are used for sputtering and ion implantation. Auger spectroscopy and x-ray diffraction were used to characterize the resulting film

  1. On the evaluation of currents in a tokamak plasma during combined Ohmic and RF current drive

    International Nuclear Information System (INIS)

    Eckhartt, D.

    1986-09-01

    By taking into account the rf-generated enhancement of the plasma electric conductivity (as formulated by Fisch in the limit of weak dc electric fields) a relation is derived between the ratio of rf to Ohmically driven currents and other plasma parameters to be measured before and after the rf onset under the condition of constant net plasma current. (author)

  2. Plasma diagnosis of RF discharge by using impedance measurement

    International Nuclear Information System (INIS)

    Huang Jianjun; Teuner, D.

    2001-01-01

    It is presented that the method known from network analysis with home-made probe and experimental setup to measure current, voltage and phase angle of RF discharge in He gas more accurately. The sheath thickness and the real and imaginary parts of the plasma impedance were obtained by using the equivalent circuit model and taking account stray capacitances of the set-up. In addition, making use of Godyak's RF discharge simple model, the electron density in the discharge was calculated at different pressure and current density

  3. Theoretical characterization of electron energy distribution function in RF plasmas

    International Nuclear Information System (INIS)

    Capitelli, M.; Capriati, G.; Dilonardo, M.; Gorse, C.; Longo, S.

    1993-01-01

    Different methods for the modeling of low-temperature plasmas of both technological and fundamental interest are discussed. The main concept of all these models is the electron energy distribution function (eedf) which is necessary to calculate the rate coefficients for any chemical reaction involving electrons. Results of eedf calculations in homogeneous SF 6 and SiH 4 plasmas are discussed based on solution of the time-dependent Boltzmann equation. The space-dependent eedf in an RF discharge in He is calculated taking into account the sheath oscillations by a Monte Carlo model assuming the plasma heating mechanism and the electric field determined by using a fluid model. The need to take into account the ambipolar diffusion of electrons in RF discharge modeling is stressed. A self-consistent model based on coupling the equations of the fluid model and the chemical kinetics ones is presented. (orig.)

  4. Coupling of RF antennas to large volume helicon plasma

    Directory of Open Access Journals (Sweden)

    Lei Chang

    2018-04-01

    Full Text Available Large volume helicon plasma sources are of particular interest for large scale semiconductor processing, high power plasma propulsion and recently plasma-material interaction under fusion conditions. This work is devoted to studying the coupling of four typical RF antennas to helicon plasma with infinite length and diameter of 0.5 m, and exploring its frequency dependence in the range of 13.56-70 MHz for coupling optimization. It is found that loop antenna is more efficient than half helix, Boswell and Nagoya III antennas for power absorption; radially parabolic density profile overwhelms Gaussian density profile in terms of antenna coupling for low-density plasma, but the superiority reverses for high-density plasma. Increasing the driving frequency results in power absorption more near plasma edge, but the overall power absorption increases with frequency. Perpendicular stream plots of wave magnetic field, wave electric field and perturbed current are also presented. This work can serve as an important reference for the experimental design of large volume helicon plasma source with high RF power.

  5. Directional rf probe for measurement of conductivity of flowing plasmas

    International Nuclear Information System (INIS)

    Jayakumar, R.; Chakravarthy, D.P.; Rohatgi, V.K.

    1977-01-01

    An electrodeless immersible rf probe for measurement of plasma conductivity in the range 0.01 to 100 mho/m has been designed and fabricated. The probe, with an overall diameter of 11 mm, employs unidirectional electromagnetic field lines which reduce the inaccuracies caused by insertion of the probe in a flowing plasma. In the range studied the probe output shows a linear relationship with the conductivity of the medium. Such probes are of interest in the study of MHD and reentry plasmas

  6. Plasma heating: NBI ampersand RF, an introduction

    International Nuclear Information System (INIS)

    Koch, R.

    1996-01-01

    The additional heating and non-inductive current-drive methods are reviewed. First, the limitations of ohmic heating in tokamaks are examined and the motivations for using additional heating in tokamaks or other machines are discussed. Next we sketch the principles of heating by injection of fast neutrals - or Neutral Beam Injection (NBI). The principle of the injector is briefly outlined. Positive and negative ion based concepts are discussed. The remainder of the lecture focuses on the processes by which the beam transfers energy to the plasma: the ionisation and slowing-down processes. Next, I make a review of the different heating schemes based on the transfer of electromagnetic energy to the plasma. The different wave heating frequency ranges are listed and the propagation and damping peculiarities are sketched in each domain. Heating in the Alfven and lower hybrid wave domains are described in some more details. 21 refs., 9 figs., 1 tab

  7. Rf probe technology for the next generation of technological plasmas

    International Nuclear Information System (INIS)

    Law, V.J.; Kenyon, A.J.; Thornhill, N.F.; Seeds, A.J.; Batty, I.

    2001-01-01

    We describe radio frequency (rf) analysis of technological plasmas at the 13.56 MHz fundamental drive frequency and integer narrow-band harmonics up to n = 9. In particular, we demonstrate the use of harmonic amplitude information as a process end-point diagnostic. Using very high frequency (vhf) techniques, we construct non-invasive ex situ remote-coupled probes: a diplexer, an equal-ratio-arm bridge, and a dual directional coupler used as a single directional device. These probes bolt into the plasma-tool 50 Ω transmission-line between the rf generator and matching network, and hence do not require modification of the plasma tool. The 50 Ω probe environment produces repeatable measurements of the chamber capacitance and narrow-band harmonic amplitude with an end-point detection sensitivity corresponding to a 2 dB change in the harmonic amplitude with the removal of 1 cm 2 of photoresist. The methodology and design of an instrument for the measurement of the plasma-tool frequency response, and the plasma harmonic amplitude and phase response are examined. The instrument allows the monitoring of the plasma phase delay, plasma-tool short- and long-term ageing, and process end-point prediction. (author)

  8. Inductive current startup in large tokamaks with expanding minor radius and rf assist

    International Nuclear Information System (INIS)

    Borowski, S.K.

    1984-02-01

    Auxiliary rf heating of electrons before and during the current-rise phase of a large tokamak, such as the Fusion Engineering Device (R = 4.8 m, a = 1.3 m, sigma = 1.6, B/sub T/ = 3.62 T), is examined as a means of reducing both the initiation loop voltage and resistive flux expenditure during startup. Prior to current initiation, 1 to 2 MW of electron cyclotron resonance heating power at approx. 90 GHz is used to create a small volume of high conductivity plasma (T/sub e/ approx. = 100 eV, n/sub e/ approx. = 10 19 m -3 ) near the upper hybrid resonance (UHR) region. This plasma conditioning permits a small radius (a 0 approx. = 0.2 to 0.4 m) current channel to be established with a relatively low initial loop voltage (less than or equal to 25 V as opposed to approx. 100 V without rf assist). During the subsequent plasma expansion and current ramp phase, a combination of rf heating (up to 5 MW) and current profile control leads to a substantial savings in volt-seconds by: (1) minimizing the resistive flux consumption; and (2) maintaining the internal flux at or near the flat profile limit

  9. Analytic analysis on asymmetrical micro arcing in high plasma potential RF plasma systems

    International Nuclear Information System (INIS)

    Yin, Y; McKenzie, D R; Bilek, M M M

    2006-01-01

    We report experimental and analytical results on asymmetrical micro arcing in a RF (radio frequency) plasma. Micro arcing, resulting from high plasma potential, in RF plasma was found to occur only on the grounded electrode for a variety of electrode and surface configurations. The analytic derivation was based on a simple RF time-dependent Child-Langmuir sheath model and electric current continuity. We found that the minimum potential difference in one RF period across the grounded electrode sheath depends on the area ratio of the grounded electrode to the powered electrode. As the area ratio increases, the minimum potential difference across a sheath increases for the grounded electrode but not for the RF powered electrode. We showed that discharge time in micro arcing is more than 100 RF periods; thus the presence of a continuous high electric field in one RF cycle results in micro arcing on the grounded electrode. However, the minimum potential difference in one RF period across the powered electrode sheath is always small so that it prevents micro arcing occurring even though the average sheath voltage can be large. This simple analytic model is consistent with particle-in-cell simulation results

  10. Simulation of plasma loading of high-pressure RF cavities

    Science.gov (United States)

    Yu, K.; Samulyak, R.; Yonehara, K.; Freemire, B.

    2018-01-01

    Muon beam-induced plasma loading of radio-frequency (RF) cavities filled with high pressure hydrogen gas with 1% dry air dopant has been studied via numerical simulations. The electromagnetic code SPACE, that resolves relevant atomic physics processes, including ionization by the muon beam, electron attachment to dopant molecules, and electron-ion and ion-ion recombination, has been used. Simulations studies have been performed in the range of parameters typical for practical muon cooling channels.

  11. Simulation of plasma loading of high-pressure RF cavities

    Energy Technology Data Exchange (ETDEWEB)

    Yu, K. [Brookhaven National Lab. (BNL), Upton, NY (United States). Computational Science Initiative; Samulyak, R. [Brookhaven National Lab. (BNL), Upton, NY (United States). Computational Science Initiative; Stony Brook Univ., NY (United States). Dept. of Applied Mathematics and Statistics; Yonehara, K. [Fermi National Accelerator Lab. (FNAL), Batavia, IL (United States); Freemire, B. [Northern Illinois Univ., DeKalb, IL (United States)

    2018-01-11

    Muon beam-induced plasma loading of radio-frequency (RF) cavities filled with high pressure hydrogen gas with 1% dry air dopant has been studied via numerical simulations. The electromagnetic code SPACE, that resolves relevant atomic physics processes, including ionization by the muon beam, electron attachment to dopant molecules, and electron-ion and ion-ion recombination, has been used. Simulations studies have also been performed in the range of parameters typical for practical muon cooling channels.

  12. Plasma properties of RF magnetron sputtering system using Zn target

    Energy Technology Data Exchange (ETDEWEB)

    Nafarizal, N.; Andreas Albert, A. R.; Sharifah Amirah, A. S.; Salwa, O.; Riyaz Ahmad, M. A. [Microelectronic and Nanotechnology - Shamsuddin Research Centre (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia 86400 Parit Raja, Batu Pahat, Johor (Malaysia)

    2012-06-29

    In the present work, we investigate the fundamental properties of magnetron sputtering plasma using Zn target and its deposited Zn thin film. The magnetron sputtering plasma was produced using radio frequency (RF) power supply and Argon (Ar) as ambient gas. A Langmuir probe was used to collect the current from the plasma and from the current intensity, we calculate the electron density and electron temperature. The properties of Zn sputtering plasma at various discharge conditions were studied. At the RF power ranging from 20 to 100 W and gas pressure 5 mTorr, we found that the electron temperature was almost unchanged between 2-2.5 eV. On the other hand, the electron temperature increased drastically from 6 Multiplication-Sign 10{sup 9} to 1 Multiplication-Sign 10{sup 10}cm{sup -3} when the discharge gas pressure increased from 5 to 10 mTorr. The electron microscope images show that the grain size of Zn thin film increase when the discharge power is increased. This may be due to the enhancement of plasma density and sputtered Zn density.

  13. Investigation of the helicon discharge plasma parameters in a hybrid RF plasma system

    International Nuclear Information System (INIS)

    Aleksandrov, A. F.; Petrov, A. K.; Vavilin, K. V.; Kralkina, E. A.; Neklyudova, P. A.; Nikonov, A. M.; Pavlov, V. B.; Ayrapetov, A. A.; Odinokov, V. V.; Sologub, V. A.; Pavlov, G. Ya.

    2016-01-01

    Results of an experimental study of the helicon discharge plasma parameters in a prototype of a hybrid RF plasma system equipped with a solenoidal antenna are described. It is shown that an increase in the external magnetic field leads to the formation of a plasma column and a shift of the maximum ion current along the discharge axis toward the bottom flange of the system. The shape of the plasma column can be controlled via varying the configuration of the magnetic field.

  14. Investigation of the helicon discharge plasma parameters in a hybrid RF plasma system

    Energy Technology Data Exchange (ETDEWEB)

    Aleksandrov, A. F.; Petrov, A. K., E-mail: alpetrov57@gmail.com; Vavilin, K. V.; Kralkina, E. A.; Neklyudova, P. A.; Nikonov, A. M.; Pavlov, V. B. [Moscow State University, Faculty of Physics (Russian Federation); Ayrapetov, A. A.; Odinokov, V. V.; Sologub, V. A.; Pavlov, G. Ya. [Research Institute of Precision Engineering (Russian Federation)

    2016-03-15

    Results of an experimental study of the helicon discharge plasma parameters in a prototype of a hybrid RF plasma system equipped with a solenoidal antenna are described. It is shown that an increase in the external magnetic field leads to the formation of a plasma column and a shift of the maximum ion current along the discharge axis toward the bottom flange of the system. The shape of the plasma column can be controlled via varying the configuration of the magnetic field.

  15. RF plasma source for heavy ion beam charge neutralization

    International Nuclear Information System (INIS)

    Efthimion, Philip C.; Gilson, Erik; Grisham, Larry; Davidson, Ronald C.; Yu, Simon S.; Logan, B. Grant

    2003-01-01

    Highly ionized plasmas are being used as a medium for charge neutralizing heavy ion beams in order to focus the ion beam to a small spot size. A radio frequency (RF) plasma source has been built at the Princeton Plasma Physics Laboratory (PPPL) in support of the joint Neutralized Transport Experiment (NTX) at the Lawrence Berkeley National Laboratory (LBNL) to study ion beam neutralization with plasma. The goal is to operate the source at pressures ∼ 10 -5 Torr at full ionization. The initial operation of the source has been at pressures of 10 -4 -10 -1 Torr and electron densities in the range of 10 8 -10 11 cm -3 . Recently, pulsed operation of the source has enabled operation at pressures in the 10 -6 Torr range with densities of 10 11 cm -3 . Near 100% ionization has been achieved. The source has been integrated with the NTX facility and experiments have begun

  16. RF-plasma interactions in the antenna near fields

    Energy Technology Data Exchange (ETDEWEB)

    Colestock, P.; Greene, G.J.; Hosea, J.C.; Phillips, C.K.; Stevens, J.E.; Ono, M.; Wilson, J.R. (Princeton Univ., NJ (USA). Plasma Physics Lab.); D' Ippolito, D.A.; Myra, J.R. (Lodestar Research Corp., Boulder, CO (USA)); Lehrman, I.S. (Grumman Aerospace Corp., Bethpage, NY (USA))

    1990-04-01

    An assessment is made of the various linear and nonlinear mechanisms that are likely to play a role in the near-field of Faraday shielded inductive antennas commonly used in ICRF heating experiments. A number of low-level, but potentially important, RF loss mechanisms have been proposed as candidates to explain the observed surface phenomena and impurity production associated with ICRF. These range from edge heating via linear processes, such as surface wave or Bernstein wave generation to a variety of nonlinear phenomena including parametric decay and RF-driven sheath effects. The various proposed mechanisms will be examined in this work in terms of the available experimental data and an evaluation will be made of the scaling of these phenomena to higher density and temperature plasmas. (orig.).

  17. Pressure dependence of electron temperature using rf-floated electrostatic probes in rf plasmas

    International Nuclear Information System (INIS)

    Cantin, A.; Gagne, R.R.J.

    1977-01-01

    A new technique, which eliminates ac between probe and plasma by means of a ''follower'', permits electrostatic probes to be used in rf plasmas with a degree of confidence and accuracy which is equal, if not better, to that for a dc discharge. Measurements in argon, using this technique, have shown that electron temperature (T/sub e/) in an rf discharge is not higher than in dc discharge. Moreover the values of T/sub e/ do not agree with von Engel's law, but are in close agreement with a theory based on free diffusion and extrapolated up to values of pR=20 Torr cm (pressure times tube radius). These results are in contradiction with published electrostatic probe results for a positive column, but agree with published results as determined by microwave radiometry and optical spectroscopy. The hypothesis is made that the supporting evidence in favor of von Engel's law, afforded by published electrostatic probe results, could be due to an artifact

  18. Modeling of Plasma Assisted Combustion

    Science.gov (United States)

    Akashi, Haruaki

    2012-10-01

    Recently, many experimental study of plasma-assisted combustion has been done. However, numerous complex reactions in combustion of hydrocarbons are preventing from theoritical study for clarifying inside the plasma-assisted combustion, and the effect of plasma-assist is still not understood. Shinohara and Sasaki [1,2] have reported that the shortening of flame length by irradiating microwave without increase of gas temperature. And they also reported that the same phenomena would occur when applying dielectric barrier discharges to the flame using simple hydrocarbon, methane. It is suggested that these phenomena may result by the electron heating. To clarify this phenomena, electron behavior under microwave and DBD was examined. For the first step of DBD plasma-assisted combustion simulation, electron Monte Carlo simulation in methane, oxygen and argon mixture gas(0.05:0.14:0.81) [2] has been done. Electron swarm parameters are sampled and electron energy distribution function (EEDF)s are also determined. In the combustion, gas temperature is higher(>1700K), so reduced electric field E/N becomes relatively high(>10V/cm/Torr). The electrons are accelerated to around 14 eV. This result agree with the optical emission from argon obtained by the experiment of reference [2]. Dissociation frequency of methane and oxygens are obtained in high. This might be one of the effect of plasma-assist. And it is suggested that the electrons should be high enough to dissociate methane, but plasma is not needed.[4pt] [1] K. Shinohara et al, J. Phys. D:Appl. Phys., 42, 182008 (1-7) (2009).[0pt] [2] K. Sasaki, 64th Annual Gaseous Electronic Conference, 56, 15 CT3.00001(2011).

  19. Measurement of toroidal plasma current in RF heated helical plasmas

    International Nuclear Information System (INIS)

    Besshou, Sakae

    1993-01-01

    This report describes the measurement of toroidal plasma current by a semiflexible Rogowski coil in a helical vacuum chamber. A Rogowski coil measures the toroidal plasma current with a resolution of 0.1 kA, frequency range of up to 1 kHz and sensitivity of 6.5 x 10 -9 V · s/A. We measured the spontaneous toroidal plasma current (from -1.2 to +1.2 kA) under electron cyclotron resonance heating at 0.94 T toroidal field in the Heliotron-E device. We found that the measured direction of toroidal plasma current changes its sign as in the predicted behavior of a neoclassical diffusion-driven bootstrap current, depending on the horizontal position of the plasma column. We explain the observed plasma currents in terms of the compound phenomenon of an ohmic current and a neoclassical diffusion-driven current. The magnitude of the neoclassical current component is smaller than the value predicted by a collisionless neoclassical theory. (author)

  20. Investigation of rf plasma light sources for dye laser excitation

    International Nuclear Information System (INIS)

    Kendall, J.S.; Jaminet, J.F.

    1975-06-01

    Analytical and experimental studies were performed to assess the applicability of radio frequency (rf) induction heated plasma light sources for potential excitation of continuous dye lasers. Experimental efforts were directed toward development of a continuous light source having spectral flux and emission characteristics approaching that required for pumping organic dye lasers. Analytical studies were performed to investigate (1) methods of pulsing the light source to obtain higher radiant intensity and (2) methods of integrating the source with a reflective cavity for pumping a dye cell. (TFD)

  1. Optical characteristics of a RF DBD plasma jet in various A r / O 2 ...

    Indian Academy of Sciences (India)

    Using the optical emission spectrum analysis of the RF plasma jet, the excitation temperature is determined based on the Boltzmann plot method. The electron density in the plasma medium of the RF plasma jet is obtained by the Stark broadening of the hydrogen Balmer H β . It is mostly seen that, the radiation intensity of Ar ...

  2. Model of inductive plasma production assisted by radio-frequency wave in tokamaks

    International Nuclear Information System (INIS)

    Hasegawa, Makoto; Hanada, Kazuaki; Sato, Kohnosuke

    2007-01-01

    For initial plasma production, an induction electric field generated by applying voltage to a poloidal field (PF) coil system is used to produce a Townsend avalanche breakdown. When the avalanche margins are small, as for the International Thermonuclear Experimental Reactor (ITER) in which the induction electric field is about 0.3 V/m, the assistance of radio-frequency waves (RF) is provided to reduce the induction electric field required for reliable breakdown. However, the conditions of RF-assisted breakdown are not clear. Here, the effects of both RF and induction electric field on the RF-assisted breakdown are evaluated considering the electron loss. When traveling loss is the dominant loss, a simple model of an extended Townsend avalanche is proposed. In this model, the induction electric field required for RF-assisted breakdown can be decreased to half that required for induction breakdown. (author)

  3. Plasma assisted heat treatment: annealing

    International Nuclear Information System (INIS)

    Brunatto, S F; Guimaraes, N V

    2009-01-01

    This work comprises a new dc plasma application in the metallurgical-mechanical field, called plasma assisted heat treatment, and it presents the first results for annealing. Annealing treatments were performed in 90% reduction cold-rolled niobium samples at 900 deg. C and 60 min, in two different heating ways: (a) in a hollow cathode discharge (HCD) configuration and (b) in a plasma oven configuration. The evolution of the samples' recrystallization was determined by means of the microstructure, microhardness and softening rate characterization. The results indicate that plasma species (ions and neutrals) bombardment in HCD plays an important role in the recrystallization process activation and could lead to technological and economical advantages considering the metallic materials' heat treatment application. (fast track communication)

  4. Study on the RF power necessary to ignite plasma for the ICP test facility at HUST

    Energy Technology Data Exchange (ETDEWEB)

    Yue, Haikun [School of Electronic Information and Communications, Huazhong University of Science and Technology, Wuhan (China); State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan (China); Li, Dong; Wang, Chenre; Li, Xiaofei; Chen, Dezhi; Liu, Kaifeng; Zhou, Chi; Pan, Ruimin [State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan (China)

    2015-10-15

    An Radio-Frequency (RF) Inductively Coupled Plasma (ICP) ion source test facility has been successfully developed at Huazhong University of Science and Technology (HUST). As part of a study on hydrogen plasma, the influence of three main operation parameters on the RF power necessary to ignite plasma was investigated. At 6 Pa, the RF power necessary to ignite plasma influenced little by the filament heating current from 5 A to 9 A. The RF power necessary to ignite plasma increased rapidly with the operation pressure decreasing from 8 Pa to 4 Pa. The RF power necessary to ignite plasma decreased with the number of coil turns from 6 to 10. During the experiments, plasma was produced with the electron density of the order of 10{sup 16}m{sup -3} and the electron temperature of around 4 eV. (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  5. RF atmospheric plasma jet surface treatment of paper

    Science.gov (United States)

    Pawlat, Joanna; Terebun, Piotr; Kwiatkowski, Michał; Diatczyk, Jaroslaw

    2016-09-01

    A radio frequency RF atmospheric pressure plasma jet was used to enhance the wettability of cellulose-based paper of 90 g m-2 and 160 g m-2 grammage as a perspective platform for antibiotic sensitivity tests. Helium and argon were the carrier gases for oxygen and nitrogen; pure water and rapeseed oil were used for goniometric tests. The influence of the flow rate and gas type, the power of the discharge, and distance from the nozzle was examined. The surface structure was observed using an optical microscope. Attenuated total reflection Fourier transform infrared (ATR-FTIR) spectra were investigated in order to determine whether cellulose degradation processes occurred. The RF plasma jet allowed us to decrease the surface contact angle without drastic changes in other features of the tested material. Experiments confirmed the significant influence of the distance between the treated sample and reactor nozzle, especially for treatment times longer than 15 s due to the greater concentration of reactive species at the surface of the sample, which decreases with distance—and their accumulation effect with time. The increase of discharge power plays an important role in decreasing the surface contact angle for times longer than 10 s. Higher power had a positive effect on the amount of generated active particles and facilitated the ignition of discharge. However, a too high value can cause a rise in temperature of the material and heat-caused damage.

  6. High plasma rotation velocity and density transitions by biased electrodes in RF produced, magnetized plasma

    International Nuclear Information System (INIS)

    Matsuyama, Shoichiro; Shinohara, Shunjiro

    2001-01-01

    A large density profile modification was successfully obtained by voltage biasing to electrodes inserted in a RF (radio frequency) produced, magnetized plasma, and formation of strong shear of azimuthal plasma rotation velocity in a supersonic regime was found. For the case of biasing to an electrode near the central plasma region, two types of density transitions were observed in the outer plasma region: one was an oscillatory transition between two states, and the other was a transition from high to low density states with a large reduction of density fluctuations. (author)

  7. High plasma rotation velocity and density transitions by biased electrodes in RF produced, magnetized plasma

    Energy Technology Data Exchange (ETDEWEB)

    Matsuyama, Shoichiro; Shinohara, Shunjiro [Kyushu Univ., Interdisciplinary Graduate School of Engineering Sciences, Fukuoka (Japan)

    2001-07-01

    A large density profile modification was successfully obtained by voltage biasing to electrodes inserted in a RF (radio frequency) produced, magnetized plasma, and formation of strong shear of azimuthal plasma rotation velocity in a supersonic regime was found. For the case of biasing to an electrode near the central plasma region, two types of density transitions were observed in the outer plasma region: one was an oscillatory transition between two states, and the other was a transition from high to low density states with a large reduction of density fluctuations. (author)

  8. Influence of Plasma Pressure Fluctuation on RF Wave Propagation

    International Nuclear Information System (INIS)

    Liu Zhiwei; Bao Weimin; Li Xiaoping; Liu Donglin; Zhou Hui

    2016-01-01

    Pressure fluctuations in the plasma sheath from spacecraft reentry affect radio-frequency (RF) wave propagation. The influence of these fluctuations on wave propagation and wave properties is studied using methods derived by synthesizing the compressible turbulent flow theory, plasma theory, and electromagnetic wave theory. We study these influences on wave propagation at GPS and Ka frequencies during typical reentry by adopting stratified modeling. We analyzed the variations in reflection and transmission properties induced by pressure fluctuations. Our results show that, at the GPS frequency, if the waves are not totally reflected then the pressure fluctuations can remarkably affect reflection, transmission, and absorption properties. In extreme situations, the fluctuations can even cause blackout. At the Ka frequency, the influences are obvious when the waves are not totally transmitted. The influences are more pronounced at the GPS frequency than at the Ka frequency. This suggests that the latter can mitigate blackout by reducing both the reflection and the absorption of waves, as well as the influences of plasma fluctuations on wave propagation. Given that communication links with the reentry vehicles are susceptible to plasma pressure fluctuations, the influences on link budgets should be taken into consideration. (paper)

  9. Low frequency RF heating of plasmas in a toroidal stellarator

    International Nuclear Information System (INIS)

    Golovato, S.N.

    1977-01-01

    Studies of transit-time magnetic pumping and Alfven wave heating have been done in the Proto-Cleo stellarator. Both plasma heating and plasma confinement have been investigated. A traveling wave was launched around the Proto-Cleo l = 2, 6 field period stellarator to attempt transit-time magnetic pumping of a pulsed electron beam moving along the magnetic field lines. An apparent loss of the beam was seen when the transit-time magnetic pumping was applied. A random walk diffusion of the beam electrons with a step size determined by the radial EXB drift due to the poloidal electric field agrees well with the experimental results. Alfven wave heating was applied to plasmas in the Proto-Cleo l = 3, 7 field period stellarator. Global excitation of Alfven waves was accomplished by exciting an electrostatically shielded helical winding corresponding to a q = 3 rational field line with a pulsed, high-power RF source. Theoretical analysis of this helical wave launcher predicted effective energy absorption in the Proto-Cleo gun-produced plasma

  10. Steady state plasma operation in RF dominated regimes on EAST

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, X. J.; Zhao, Y. P.; Gong, X. Z.; Hu, C. D.; Liu, F. K.; Hu, L. Q.; Wan, B. N., E-mail: bnwan@ipp.ac.cn; Li, J. G. [Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031 (China)

    2015-12-10

    Significant progress has recently been made on EAST in the 2014 campaign, including the enhanced CW H&CD system over 20MW heating power (LHCD, ICRH and NBI), more than 70 diagnostics, ITER-like W-monoblock on upper divertor, two inner cryo-pumps and RMP coils, enabling EAST to investigate long pulse H mode operation with dominant electron heating and low torque to address the critical issues for ITER. H-mode plasmas were achieved by new H&CD system or 4.6GHz LHCD alone for the first time. Long pulse high performance H mode has been obtained by LHCD alone up to 28s at H{sub 98}∼1.2 or by combing of ICRH and LHCD, no or small ELM was found in RF plasmas, which is essential for steady state operation in the future Tokamak. Plasma operation in low collision regimes were implemented by new 4.6GHz LHCD with core Te∼4.5keV. The non-inductive scenarios with high performance at high bootstrap current fraction have been demonstrated in RF dominated regimes for long pulse operation. Near full non-inductive CD discharges have been achieved. In addition, effective heating and decoupling method under multi-transmitter for ICRF system were developed in this campaign, etc. EAST could be in operation with over 30MW CW heating and current drive power (LHCD ICRH NBI and ECRH), enhanced diagnostic capabilities and full actively-cooled metal wall from 2015. It will therefore allow to access new confinement regimes and to extend these regimes towards to steady state operation.

  11. RF plasma nitriding of severely deformed iron-based alloys

    International Nuclear Information System (INIS)

    Ferkel, H.; Glatzer, M.; Estrin, Y.; Valiev, R.Z.; Blawert, C.; Mordike, B.L.

    2003-01-01

    The effect of severe plastic deformation by cold high pressure torsion (HPT) on radio frequency (RF) plasma nitriding of pure iron, as well as St2K50 and X5CrNi1810 steels was investigated. Nitriding was carried out for 3 h in a nitrogen atmosphere at a pressure of 10 -5 bar and temperatures of 350 and 400 deg. C. Nitrided specimens were analysed by scanning electron microscopy (SEM), X-ray diffraction and micro hardness measurements. It was found that HPT enhances the effect of nitriding leading almost to doubling of the thickness of the nitrided layer for pure iron and the high alloyed steel. The largest increase in hardness was observed when HPT was combined with RF plasma nitriding at 350 deg. C. In the case of pure iron, the X-ray diffraction spectra showed the formation of ε and γ' nitrides in the compound layer, with a preferential formation of γ' at the expense of the α-phase at the higher nitriding temperature. The corresponding surface hardness was up to 950 HV0.01. While the HPT-processed St2K50 exhibits both nitride phases after nitriding at 350 deg. C, only the γ'-phase was observed after nitriding at 400 deg. C. A surface hardness of up to 1050 HV0.01 was measured for this steel. The high alloyed steel X5CrNi1810 exhibited the highest increase in surface hardness when HPT was combined with nitriding at 350 deg. C. The surface hardness of this steel was greater than 1400 HV0.025. The XRD analyses indicate the formation of the expanded austenite (S-phase) in the surface layer as a result of RF plasma nitriding. Furthermore, after HPT X5CrNi1810 was transformed completely into deformation martensite which did not transform back to austenite under thermochemical treatment. However, in the case of nitriding of the HPT-processed high alloyed steel at 400 deg. C, the formation of the S-phase was less pronounced. In view of the observed XRD peak broadening, the formation of nitrides, such as e.g. CrN, cannot be ruled out

  12. Preparation of Pb(Zr, Ti)O3 Thin Films by Plasma-Assisted Sputtering

    Science.gov (United States)

    Hioki, Tsuyoshi; Akiyama, Masahiko; Ueda, Tomomasa; Onozuka, Yutaka; Suzuki, Kouji

    1999-09-01

    A novel plasma-assisted RF magnetron sputtering system with an immersed coil antenna between a target and a substrate was applied for preparing Pb(Zr, Ti)O3 (PZT) thin films. The antenna enabled the generation of inductively coupled plasma (ICP) independently of the target RF source. The plasma assisted by the antenna resulted in the changes of ion fluxes and these energy distributions irradiating to the substrate. The crystalline phase of the deposited PZT thin films was occupied by the perovskite phase depending on the antenna power. In addition, a high deposition rate, modified uniformity of film thickness, and a dense film structure with large columnar grains were obtained as a result of effects of the assisted plasma. The application of the plasma-assisted sputtering method may enable the preparation of PZT thin films that haveexcellent properties.

  13. Investigation of RF-enhanced plasma potentials on Alcator C-Mod

    Energy Technology Data Exchange (ETDEWEB)

    Ochoukov, R., E-mail: ochoukov@psfc.mit.edu [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States); Whyte, D.G.; Brunner, D. [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States); Cziegler, I. [Center for Energy Research, UCSD, 9500 Gilman Drive, La Jolla, CA 92093 (United States); LaBombard, B.; Lipschultz, B. [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States); Myra, J. [Lodestar Research Corporation, 2400 Central Avenue P-5, Boulder, CO 80301 (United States); Terry, J.; Wukitch, S. [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States)

    2013-07-15

    Radio frequency (RF) sheath rectification is a leading mechanism suspected of causing anomalously high erosion of plasma facing materials in RF-heated plasmas on Alcator C-Mod. An extensive experimental survey of the plasma potential (Φ{sub P}) in RF-heated discharges on C-Mod reveals that significant Φ{sub P} enhancement (>100 V) is found on outboard limiter surfaces, both mapped and not mapped to active RF antennas. Surfaces that magnetically map to active RF antennas show Φ{sub P} enhancement that is, in part, consistent with the recently proposed slow wave rectification mechanism. Surfaces that do not map to active RF antennas also experience significant Φ{sub P} enhancement, which strongly correlates with the local fast wave intensity. In this case, fast wave rectification is a leading candidate mechanism responsible for the observed enhancement.

  14. Investigation of RF-enhanced plasma potentials on Alcator C-Mod

    International Nuclear Information System (INIS)

    Ochoukov, R.; Whyte, D.G.; Brunner, D.; Cziegler, I.; LaBombard, B.; Lipschultz, B.; Myra, J.; Terry, J.; Wukitch, S.

    2013-01-01

    Radio frequency (RF) sheath rectification is a leading mechanism suspected of causing anomalously high erosion of plasma facing materials in RF-heated plasmas on Alcator C-Mod. An extensive experimental survey of the plasma potential (Φ P ) in RF-heated discharges on C-Mod reveals that significant Φ P enhancement (>100 V) is found on outboard limiter surfaces, both mapped and not mapped to active RF antennas. Surfaces that magnetically map to active RF antennas show Φ P enhancement that is, in part, consistent with the recently proposed slow wave rectification mechanism. Surfaces that do not map to active RF antennas also experience significant Φ P enhancement, which strongly correlates with the local fast wave intensity. In this case, fast wave rectification is a leading candidate mechanism responsible for the observed enhancement

  15. A Tightly Coupled Non-Equilibrium Magneto-Hydrodynamic Model for Inductively Coupled RF Plasmas

    Science.gov (United States)

    2016-02-29

    development a tightly coupled magneto-hydrodynamic model for Inductively Coupled Radio- Frequency (RF) Plasmas. Non Local Thermodynamic Equilibrium (NLTE...for Inductively Coupled Radio-Frequency (RF) Plasmas. Non Local Thermodynamic Equilibrium (NLTE) effects are described based on a hybrid State-to-State...Inductively Coupled Plasma (ICP) torches have wide range of possible applications which include deposition of metal coatings, synthesis of ultra-fine powders

  16. Selection of suitable diagnostic techniques for an RF atmospheric pressure plasma

    International Nuclear Information System (INIS)

    Kong, M.G.; Deng, X.T.

    2001-01-01

    As an early report of our study, this paper summaries the RF atmospheric pressure plasma system we intend to characterize and a number of diagnostic techniques presently under assessment for our plasma rig. By discussing the advantages and disadvantages of these diagnostic techniques at this meeting, we hope to gain feedback and comments to improve our choice of appropriate diagnostic techniques as well as our subsequent application of these techniques to nonthermal RF atmospheric pressure plasmas

  17. Experimental study of the interaction between RF antennas and the edge plasma of a tokamak

    International Nuclear Information System (INIS)

    Kubic, Martin

    2013-01-01

    Antennas operating in the ion cyclotron range of frequency (ICRF) provide a useful tool for plasma heating in many tokamaks and are foreseen to play an important role in ITER. However, in addition to the desired heating in the core plasma, spurious interactions with the plasma edge and material boundary are known to occur. Many of these deleterious effects are caused by the formation of radio-frequency (RF) sheaths. The aim of this thesis is to study, mainly experimentally, scrape-off layer (SOL) modifications caused by RF sheaths effects by means of Langmuir probes that are magnetically connected to a powered ICRH antenna. Effects of the two types of Faraday screens' operation on RF-induced SOL modifications are studied for different plasma and antenna configurations - scans of strap power ratio imbalance, injected power and SOL density. In addition to experimental work, the influence of RF sheaths on retarding field analyzer (RFA) measurements of sheath potential is investigated with one-dimensional particle-in-cell code. One-dimensional particle-in-cell simulations show that the RFA is able to measure reliably the sheath potential only for ion plasma frequencies ω π similar to RF cyclotron frequency ω rf , while for the real SOL conditions (ω π ≥ ω rf ), when the RFA is magnetically connected to RF region, it is strongly underestimated. An alternative method to investigate RF sheaths effects is proposed by using broadening of the ion distribution function as an evidence of the RF electric fields in the sheath. RFA measurements in Tore Supra indicate that RF potentials do indeed propagate from the antenna 12 m along magnetic field lines. (author) [fr

  18. Dynamics of r.f. production of Stellarator plasmas in the ion cyclotron range of frequency

    International Nuclear Information System (INIS)

    Moiseenko, V.E.; Lysoivan, A.I.; Kasilov, S.V.; Plyusnin, V.V.

    1995-01-01

    The present study investigated numerically the process of r.f. production of plasma in the URAGAN-3M torsatron in the frequency range below the ion cyclotron frequency (ω ci ). The dynamics of r.f. plasma build-up at the stages of neutral gas burnout and plasma heating were studied using a zero-dimensional transport code, in which the plasma confinement law was determined by large helical device scaling. Two models for input r.f. power were used. In the first case, the r.f. power absorbed by the electrons was computed by a one-dimensional r.f. code solving Maxwell's boundary problem equations. The mechanisms of electron heating through direct excitation of the slow wave (SW) by antennae as well as the conversion of fast wave (FW) into SW in the vicinity of Alfven resonance (scenario of Alfven heating) were taken into account in the computations. In the second case, an 'ideal' model of r.f. power deposition onto the electrons as a linear function of plasma density was employed. A noticeable difference in plasma production dynamics computed for these two cases was found. Better agreement with experimental data obtained from the URAGAN-3M torsatron was found for the first case resulting from combination of the one-dimensional r.f. and zero-dimensional transport codes. ((orig.))

  19. RF-plasma vapor deposition of siloxane on paper. Part 2: Chemical evolution of paper surface

    International Nuclear Information System (INIS)

    Sahin, Halil Turgut

    2013-01-01

    Highlights: ► Investigate the detailed RF-cold plasma surface modified paper by XPS and ATR-FTIR. ► Some chemical analysis of RF-cold plasma surface modified paper after RF plasma treatment. ► Identify the connection between RF plasma treatment and the surface chemistry of paper surface. - Abstract: Survey and high-resolution (HR) XPS studies indicate that OMCTSO plasma treatment created a new silicon containing functional groups and changed the hydroxyl content on the surface of paper. Four intense survey XPS spectrum peaks were observed for the OMCTSO plasma treated paper. They were the Si 2p at 100 eV, Si 2s at 160 eV, C 1s at 285 eV, and O 1s at 525 eV for the plasma modified surface. It was realized that the macromolecular chain-breaking mechanisms and plasma-induced etching processes control the number and the availability of OH-functionalities during OMCTSO plasma exposure on paper. The reaction, initiated by these species, depends mainly on the nature of chemicals in the plasma as well as on the energy level of the plasma and the nature of the surface effects in the modification of the paper. The ATR-FTIR spectrum of paper treated with OMCTSO plasma has characteristic absorption bands attributed to the Si-O and Si-O-Si formations on the surface.

  20. Particle melting and particle/plasma interactions in DC and RF plasmas: a modeling study. (Volumes I and II)

    International Nuclear Information System (INIS)

    Wei, D.Y.C.

    1987-01-01

    Integral process models were developed to predict particle melting in both DC and RF plasmas. Specifically, a numerical model has been developed to predict the temperature history of particles injected in a low pressure DC plasma jet. The temperature and velocity fields of the plasma jet are predicted as a free jet by solving the parabolized Navier-Stokes equations using a spatial marching scheme. Correction factors were introduced to take into account non continuum effects encountered in the low pressure environment. The plasma jet profiles as well as the particle/plasma interactions under different jet pressure ratios (from underexpanded to overexpanded) were investigated. The flow and temperature fields in the RF plasma torch are calculated using the axisymmetric Navier-Stokes equations based on the primitive variables, along with pseudo two-dimensional electromagnetic field equations. Particle trajectories and heat transfer characteristics in both DC and RF plasmas are calculated using predicted plasma jet profiles. Particle melting efficiencies in both DC and RF plasmas are evaluated and compared using model alloy systems. Based on the theoretical considerations, an alternative route of plasma spraying process (hybrid plasma spraying process) is proposed. An evaluation of particle melting in hybrid plasma jets had indicated that further improvement in deposit properties could be made

  1. Development and Performance Analysis of a Photonics-Assisted RF Converter for 5G Applications

    Science.gov (United States)

    Borges, Ramon Maia; Muniz, André Luiz Marques; Sodré Junior, Arismar Cerqueira

    2017-03-01

    This article presents a simple, ultra-wideband and tunable radiofrequency (RF) converter for 5G cellular networks. The proposed optoelectronic device performs broadband photonics-assisted upconversion and downconversion using a single optical modulator. Experimental results demonstrate RF conversion from DC to millimeter waves, including 28 and 38 GHz that are potential frequency bands for 5G applications. Narrow linewidth and low phase noise characteristics are observed in all generated RF carriers. An experimental digital performance analysis using different modulation schemes illustrates the applicability of the proposed photonics-based device in reconfigurable optical wireless communications.

  2. Chemical compositions of spherical titanium powders prepared by RF induction plasma

    International Nuclear Information System (INIS)

    Gu Zhongtao; Jin Yuping; Ye Gaoying

    2012-01-01

    Spherical titanium powders were prepared by RF induction plasma technology. The particle size is essentially un- changed, while the particle size distribution is relatively narrow after spheroidization processing. X-ray diffraction (XRD) random testing of the spherical titanium powders shows no structure and phase changes. The content of O, H, N and C decreases, while the content of Ti increases slightly. It indicates that spheroidization with RF plasma can enhance powder purity. (authors)

  3. Effect on antenna structure of high power rf during plasma operation

    International Nuclear Information System (INIS)

    Haste, G.R.; Thomas, C.E.; Fadnek, A.; Carter, M.D.; Beaumont, B.; Becoulet, A.; Kuus, H.; Saoutic, B.

    1993-01-01

    High-power, long-pulse operation on the Tore Supra tokamak results in considerable stress on the plasma-facing components. The ICH antennas must deliver high-power rf(up to 4 MW per antenna) in this environment. The antenna structure is therefore subjected to the power flux resulting from the interaction between rf and the edge plasma. The structure's response during operation is described, as is the condition of the antenna after prolonged use

  4. Sheath and bulk expansion induced by RF bias in atmospheric pressure microwave plasma

    Science.gov (United States)

    Lee, Jimo; Nam, Woojin; Lee, Jae Koo; Yun, Gunsu

    2017-10-01

    A large axial volume expansion of microwave-driven plasma at atmospheric pressure is achieved by applying a low power radio frequency (RF) bias at an axial location well isolated from the original plasma bulk. The evolution of the plasma plume visualized by high speed ICCD imaging suggest that the free electrons drifting toward the bias electrode cause the prodigious expansion of the sheath, creating a stable plasma stream channel between the microwave and the RF electrodes. For argon plasma in ambient air, enhanced emissions of OH and N2 spectral lines are measured in the extended plume region, supporting the acceleration of electrons and subsequent generation of radical species. The coupling of RF bias with microwave provides an efficient way of enlarging the plasma volume and enhancing the production of radicals. Work supported by the National Research Foundation of Korea under BK21+ program and Grant No. 2015R1D1A1A01061556 (Ministry of Education).

  5. The difference between the metal ion extracted from the R.F. ion source by applying plasma chemistry reaction and by non-plasma range chemistry reaction

    International Nuclear Information System (INIS)

    Bai Gui Bin

    1987-01-01

    The paper introduced the difference between using plasma chemistry reaction draw metal ion and non-plasma range chemistry reaction in the R.F. ion source. By using of the plasma chemistry reaction draw metal ion higher percentage than non-plasma range chemistry reaction in the R.F. ion source. The authors plasma chemistry reaction to R.F. ion source and implanter successfully. The effect is very well, it has its own characteristic

  6. RF compensation of single Langmuir probe in low density helicon plasma

    Energy Technology Data Exchange (ETDEWEB)

    Ghosh, Soumen, E-mail: soumen@ipr.res.in; Chattopadhyay, Prabal K.; Ghosh, Joydeep; Bora, Dhiraj

    2016-11-15

    Highlights: • Appropriate density and temperature measurement with Langmuir probe in RF Eenvironment. • Necessity of large auxiliary electrode for RF compensation at low densities (∼10{sup 16} m{sup −3}). • Measured two temperature electrons in low pressure helicon antenna produced RF plasma. • Tail electrons are localized only at off-axis in our cylindrical plasma system. - Abstract: Interpretations of Single Langmuir probe measurements in electrode-less radio frequency (RF) plasmas are noteworthy tricky and require adequate compensation of RF. Conventional RF compensation technique is limited only at high density (>10{sup 17} m{sup −3}) RF plasmas. RF compensation of single Langmuir probe at low density RF plasmas (∼10{sup 16} m{sup −3}) is presented in this paper. In RF driven plasmas, where the RF voltage is high (∼50 V) and density is in the range (∼10{sup 16} m{sup −3}), the primary RF compensation condition (Z{sub ck} > >Z{sub sh}) is very difficult to fulfill, because of high sheath impedance (Z{sub sh}) at 13.56 MHz and the construction limitation of a self-resonant tiny chock (Z{sub ck}) with very high impedance. Introducing a large auxiliary electrode (A{sub x}), (A{sub x} >>> A{sub p}), close to the small Langmuir probe (A{sub p}) tip, connected in parallel with probe via a coupling capacitor (C{sub cp}), significantly reduces the effective sheath impedance (Z{sub sh}) and allows probe bias to follow the RF oscillation. Dimensional requirements of the auxiliary electrode and the role of suitable coupling capacitor are discussed in this paper. Observations show proper compensation leads to estimation of more positive floating potentials and lower electron temperatures compared to uncompensated probe. The electron energy probability function (EEPF) is also obtained by double differentiating the collected current with respect to the applied bias voltage using an active analog circuit.

  7. Diagnostic study of multiple double layer formation in expanding RF plasma

    Science.gov (United States)

    Chakraborty, Shamik; Paul, Manash Kumar; Roy, Jitendra Nath; Nath, Aparna

    2018-03-01

    Intensely luminous double layers develop and then expand in size in a visibly glowing RF discharge produced using a plasma source consisting of a semi-transparent cylindrical mesh with a central electrode, in a linear plasma chamber. Although RF discharge is known to be independent of device geometry in the absence of magnetic field, the initiation of RF discharge using such a plasma source results in electron drift and further expansion of the plasma in the vessel. The dynamics of complex plasma structures are studied through electric probe diagnostics in the expanding RF plasma. The measurements made to study the parametric dependence of evolution of double layer structures are analyzed and presented here. The plasma parameter measurements suggest that the complex potential structures initially form with low potential difference between the layers and then gradually expand producing burst oscillations. The present study provides interesting information about the stability of plasma sheath and charge particle dynamics in it that are important to understand the underlying basic sheath physics along with applications in plasma acceleration and propulsion.

  8. Current sustaining by RF travelling field in a collisional toroidal plasma

    International Nuclear Information System (INIS)

    Fukuda, Masaji; Matsuura, Kiyokata.

    1977-06-01

    The relation between the current generation by RF travelling field and the accompanied power absorption is studied in a collisional toroidal plasma, parameters being phase velocity and filling gas pressure or electron collision frequency. It is observed at a low magnetic field that the current is proportional to the plasma conductivity and an effective electromotive force, which is a new concept introduced on the basis of fluid model; the electromotive force is proportional to the absorbed RF power and inversely proportional to the plasma density and the phase velocity of the travelling field. (auth.)

  9. Current sustaining by RF travelling field in a collisional toroidal plasma

    International Nuclear Information System (INIS)

    Fukuda, Masaji; Matsuura, Kiyokata

    1978-01-01

    The relation between the current generated by RF travelling field and the absorbed power is studied in a collisional toroidal plasma, parameters being phase velocity and filling gap pressure or electron collision frequency. It is observed at a low magnetic field that the current is proportional to the plasma conductivity and an effective electromotive force, which is a new concept introduced on the basis of fluid model; the electromotive force is proportional to the absorbed RF power and inversely proportional to the plasma density and the phase velocity of the travelling field. (author)

  10. Poloidal plasma rotation in the presence of RF waves in tokamaks

    International Nuclear Information System (INIS)

    Weyssow, B.; Liu, Caigen

    2001-01-01

    It is well known that one of the consequences of strong RF heating is the deformation of the equilibrium distribution function that induces a change in plasma transport and plasma rotation. The poloidal plasma rotation during RF wave heating in tokamaks is investigated using a moment approach. A set of closed, self-consistent transport and rotation equations is derived and reduced to a single equation for the poloidal particle flux. The formulas are sufficiently general to apply to heating schemes that can be represented by a quasilinear operator. (author)

  11. Diagnostics of an rf induction plasma torch with the aid of a magnetic probe

    International Nuclear Information System (INIS)

    Shamim, A.; Wooding, E.R.

    1978-01-01

    Estimates of a plasma temperature, electrical conductivity, and torch efficiency have been made from simple measurements made on the plasma and on the rf supply. Measurements were made with the aid of a simple magnetic probe and a pickup coil. Estimates are also made of the heating-coil constants

  12. Voltage uniformity study in large-area reactors for RF plasma deposition

    Energy Technology Data Exchange (ETDEWEB)

    Sansonnens, L.; Pletzer, A.; Magni, D.; Howling, A.A.; Hollenstein, C. [Ecole Polytechnique Federale, Lausanne (Switzerland). Centre de Recherche en Physique des Plasma (CRPP); Schmitt, J.P.M. [Balzers Process Systems, Palaiseau (France)

    1996-09-01

    Non-uniform voltage distribution across the electrode area results in inhomogeneous thin-film RF plasma deposition in large area reactors. In this work, a two-dimensional analytic model for the calculation of the voltage distribution across the electrode area is presented. The results of this model are in good agreement with measurements performed without plasma at 13.56 MHz and 70 MHz in a large area reactor. The principal voltage inhomogeneities are caused by logarithmic singularities in the vicinity of RF connections and not by standing waves. These singularities are only described by a two-dimensional model and cannot be intuitively predicted by analogy to a one-dimensional case. Plasma light emission measurements and thickness homogeneity studies of a-Si:H films show that the plasma reproduces these voltage inhomogeneities. Improvement of the voltage uniformity is investigated by changing the number and position of the RF connections. (author) 13 figs., 20 refs.

  13. Influence of the RF electrode cleanliness on plasma characteristics and dust-particle generation in methane dusty plasmas

    Science.gov (United States)

    Géraud-Grenier, I.; Desdions, W.; Faubert, F.; Mikikian, M.; Massereau-Guilbaud, V.

    2018-01-01

    The methane decomposition in a planar RF discharge (13.56 MHz) leads both to a dust-particle generation in the plasma bulk and to a coating growth on the electrodes. Growing dust-particles fall onto the grounded electrode when they are too heavy. Thus, at the end of the experiment, the grounded electrode is covered by a coating and by fallen dust-particles. During the dust-particle growth, the negative DC self-bias voltage (VDC) increases because fewer electrons reach the RF electrode, leading to a more resistive plasma and to changes in the plasma chemical composition. In this paper, the cleanliness influence of the RF electrode on the dust-particle growth, on the plasma characteristics and composition is investigated. A cleanliness electrode is an electrode without coating and dust-particles on its surface at the beginning of the experiment.

  14. RF-heating of plasma in the frequency domain of the ion cyclotron harmonics

    International Nuclear Information System (INIS)

    Hahnekamp, H.G.; Stampa, A.; Tuczek, H.; Laeuter, R.; Wulf, H.O.

    1976-01-01

    Experiments on rf-heating of plasmas in the frequency domain of the ion cyclotron harmonics are reported. The rf-power is coupled to the magneto-acoustic wave for frequencies between ωsub(ci) and 5ωsub(ci). The measurements indicate that the damping of the pump wave is mainly due to the excitation of turbulence, whereas direct resonance at 2ωsub(ci) seems to be of minor importance

  15. Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

    NARCIS (Netherlands)

    Profijt, H. B.; M. C. M. van de Sanden,; Kessele, W. M. M.

    2013-01-01

    Two substrate-biasing techniques, i.e., substrate-tuned biasing and RF biasing, have been implemented in a remote plasma configuration, enabling control of the ion energy during plasma-assisted atomic layer deposition (ALD). With both techniques, substrate bias voltages up to -200 V have been

  16. Cryogenic rf test of the first SRF cavity etched in an rf Ar/Cl2 plasma

    Science.gov (United States)

    Upadhyay, J.; Palczewski, A.; Popović, S.; Valente-Feliciano, A.-M.; Im, Do; Phillips, H. L.; Vušković, L.

    2017-12-01

    An apparatus and a method for etching of the inner surfaces of superconducting radio frequency (SRF) accelerator cavities are described. The apparatus is based on the reactive ion etching performed in an Ar/Cl2 cylindrical capacitive discharge with reversed asymmetry. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity was used. The single cell cavity was mechanically polished and buffer chemically etched and then rf tested at cryogenic temperatures to provide a baseline characterization. The cavity's inner wall was then exposed to the capacitive discharge in a mixture of Argon and Chlorine. The inner wall acted as the grounded electrode, while kept at elevated temperature. The processing was accomplished by axially moving the dc-biased, corrugated inner electrode and the gas flow inlet in a step-wise manner to establish a sequence of longitudinally segmented discharges. The cavity was then tested in a standard vertical test stand at cryogenic temperatures. The rf tests and surface condition results, including the electron field emission elimination, are presented.

  17. Cryogenic rf test of the first SRF cavity etched in an rf Ar/Cl2 plasma

    Directory of Open Access Journals (Sweden)

    J. Upadhyay

    2017-12-01

    Full Text Available An apparatus and a method for etching of the inner surfaces of superconducting radio frequency (SRF accelerator cavities are described. The apparatus is based on the reactive ion etching performed in an Ar/Cl2 cylindrical capacitive discharge with reversed asymmetry. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity was used. The single cell cavity was mechanically polished and buffer chemically etched and then rf tested at cryogenic temperatures to provide a baseline characterization. The cavity’s inner wall was then exposed to the capacitive discharge in a mixture of Argon and Chlorine. The inner wall acted as the grounded electrode, while kept at elevated temperature. The processing was accomplished by axially moving the dc-biased, corrugated inner electrode and the gas flow inlet in a step-wise manner to establish a sequence of longitudinally segmented discharges. The cavity was then tested in a standard vertical test stand at cryogenic temperatures. The rf tests and surface condition results, including the electron field emission elimination, are presented.

  18. TOPICAL REVIEW: Plasma assisted ignition and combustion

    Science.gov (United States)

    Starikovskaia, S. M.

    2006-08-01

    In recent decades particular interest in applications of nonequilibrium plasma for the problems of plasma-assisted ignition and plasma-assisted combustion has been observed. A great amount of experimental data has been accumulated during this period which provided the grounds for using low temperature plasma of nonequilibrium gas discharges for a number of applications at conditions of high speed flows and also at conditions similar to automotive engines. The paper is aimed at reviewing the data obtained and discusses their treatment. Basic possibilities of low temperature plasma to ignite gas mixtures are evaluated and historical references highlighting pioneering works in the area are presented. The first part of the review discusses plasmas applied to plasma-assisted ignition and combustion. The paper pays special attention to experimental and theoretical analysis of some plasma parameters, such as reduced electric field, electron density and energy branching for different gas discharges. Streamers, pulsed nanosecond discharges, dielectric barrier discharges, radio frequency discharges and atmospheric pressure glow discharges are considered. The second part depicts applications of discharges to reduce the ignition delay time of combustible mixtures, to ignite transonic and supersonic flows, to intensify ignition and to sustain combustion of lean mixtures. The results obtained by different authors are cited, and ways of numerical modelling are discussed. Finally, the paper draws some conclusions on the main achievements and prospects of future investigations in the field.

  19. “Virtual IED sensor” at an rf-biased electrode in low-pressure plasma

    Energy Technology Data Exchange (ETDEWEB)

    Bogdanova, M. A.; Zyryanov, S. M. [Skobeltsyn Institute of Nuclear Physics, Moscow State University, SINP MSU, Moscow (Russian Federation); Faculty of Physics, Moscow State University, MSU, Moscow (Russian Federation); Lopaev, D. V.; Rakhimov, A. T. [Skobeltsyn Institute of Nuclear Physics, Moscow State University, SINP MSU, Moscow (Russian Federation)

    2016-07-15

    Energy distribution and the flux of the ions coming on a surface are considered as the key-parameters in anisotropic plasma etching. Since direct ion energy distribution (IED) measurements at the treated surface during plasma processing are often hardly possible, there is an opportunity for virtual ones. This work is devoted to the possibility of such indirect IED and ion flux measurements at an rf-biased electrode in low-pressure rf plasma by using a “virtual IED sensor” which represents “in-situ” IED calculations on the absolute scale in accordance with a plasma sheath model containing a set of measurable external parameters. The “virtual IED sensor” should also involve some external calibration procedure. Applicability and accuracy of the “virtual IED sensor” are validated for a dual-frequency reactive ion etching (RIE) inductively coupled plasma (ICP) reactor with a capacitively coupled rf-biased electrode. The validation is carried out for heavy (Ar) and light (H{sub 2}) gases under different discharge conditions (different ICP powers, rf-bias frequencies, and voltages). An EQP mass-spectrometer and an rf-compensated Langmuir probe (LP) are used to characterize plasma, while an rf-compensated retarded field energy analyzer (RFEA) is applied to measure IED and ion flux at the rf-biased electrode. Besides, the pulsed selfbias method is used as an external calibration procedure for ion flux estimating at the rf-biased electrode. It is shown that pulsed selfbias method allows calibrating the IED absolute scale quite accurately. It is also shown that the “virtual IED sensor” based on the simplest collisionless sheath model allows reproducing well enough the experimental IEDs at the pressures when the sheath thickness s is less than the ion mean free path λ{sub i} (s < λ{sub i}). At higher pressure (when s > λ{sub i}), the difference between calculated and experimental IEDs due to ion collisions in the sheath is observed in the low

  20. Application of capacitively coupled rf discharge plasma for sterilization of polymer materials used in ophthalmology

    International Nuclear Information System (INIS)

    Abdullin, I.Sh.; Avetisov, S.E.; Lipatov, D.V.; Rybakova, E.G.; Bragin, V.E.; Bykanov, A.N.; Kamarentsev, E.N.

    1996-01-01

    The sterilization effect of capacitively coupled rf discharge plasma treatment of contact lenses was investigated. There were used two types of polymer: highly hydrophilic polymer with water content 76% (Navelen-76) and poly-methylmethacrylate (PMMA). There was demonstrated the possibility of effective sterilization by RF discharge plasma of a set of polymer materials used in ophthalmology. The best results were obtained for hard contact lenses. There was perfect sterilization in this case. There were not perfect sterilization in some cases of soft contact lenses treatment. It may be caused by porous structure of the external layers of this material and limited thickness of the sterilization layer. (author)

  1. Investigation of surface boundary conditions for continuum modeling of RF plasmas

    Science.gov (United States)

    Wilson, A.; Shotorban, B.

    2018-05-01

    This work was motivated by a lacking general consensus in the exact form of the boundary conditions (BCs) required on the solid surfaces for the continuum modeling of Radiofrequency (RF) plasmas. Various kinds of number and energy density BCs on solid surfaces were surveyed, and how they interacted with the electric potential BC to affect the plasma was examined in two fundamental RF plasma reactor configurations. A second-order local mean energy approximation with equations governing the electron and ion number densities and the electron energy density was used to model the plasmas. Zero densities and various combinations of drift, diffusion, and thermal fluxes were considered to set up BCs. It was shown that the choice of BC can have a significant impact on the sheath and bulk plasma. The thermal and diffusion fluxes to the surface were found to be important. A pure drift BC for dielectric walls failed to produce a sheath.

  2. Physics-electrical hybrid model for real time impedance matching and remote plasma characterization in RF plasma sources.

    Science.gov (United States)

    Sudhir, Dass; Bandyopadhyay, M; Chakraborty, A

    2016-02-01

    Plasma characterization and impedance matching are an integral part of any radio frequency (RF) based plasma source. In long pulse operation, particularly in high power operation where plasma load may vary due to different reasons (e.g. pressure and power), online tuning of impedance matching circuit and remote plasma density estimation are very useful. In some cases, due to remote interfaces, radio activation and, due to maintenance issues, power probes are not allowed to be incorporated in the ion source design for plasma characterization. Therefore, for characterization and impedance matching, more remote schemes are envisaged. Two such schemes by the same authors are suggested in these regards, which are based on air core transformer model of inductive coupled plasma (ICP) [M. Bandyopadhyay et al., Nucl. Fusion 55, 033017 (2015); D. Sudhir et al., Rev. Sci. Instrum. 85, 013510 (2014)]. However, the influence of the RF field interaction with the plasma to determine its impedance, a physics code HELIC [D. Arnush, Phys. Plasmas 7, 3042 (2000)] is coupled with the transformer model. This model can be useful for both types of RF sources, i.e., ICP and helicon sources.

  3. Characterization of gaseous species in scanning atmospheric rf plasma with transmission infrared spectroscopy

    International Nuclear Information System (INIS)

    Kim, Seong H.; Kim, Jeong Hoon; Kang, Bang-Kwon

    2008-01-01

    A scanning atmospheric radio-frequency (rf) plasma was analyzed with transmission infrared (IR) spectroscopy. The IR analyses were made for the plasmas used for hydrophobic coating deposition and superhydrophobic coating deposition processes. Since the rf plasma was generated in a small open space with a high gas flow rate in ambient air, the density of gas-phase molecules was very high and the plasma-generated reactive species seemed to undergo various reactions in the gas phase. So, the transmission IR spectra of the scanning atmospheric rf plasma were dominated by gas-phase reaction products, rather than plasma-generated intermediate species. In the CH 4 /He plasma used for hydrophobic coating deposition, C 2 H 6 , C 2 H 2 , and a small amount of C 2 H 4 as well as CO were detected in transmission IR. The intensities of these peaks increased as the rf power increased. The CO formation is due to the activation of oxygen and water in the air. In the CF 4 /H 2 /He plasma used for deposition of superhydrophobic coatings, C 2 F 6 , CF 3 H, COF 2 , and HF were mainly detected. When the H 2 /CF 4 ratio was ∼0.5, the consumption of CF 4 was the highest. As the H 2 /CF 4 ratio increased higher, the C 2 F 6 production was suppressed while the CF 3 H peak grew and the formation of CH 4 were detected. In both CH 4 /He and CF 4 /H 2 /He plasma systems, the undissociated feed gas molecules seem to be highly excited vibrationally and rotationally. The information on plasma-generated reactive species and their reactions was deduced from the distribution of these gas-phase reaction products

  4. The effect of phase difference between powered electrodes on RF plasmas

    International Nuclear Information System (INIS)

    Proschek, M; Yin, Y; Charles, C; Aanesland, A; McKenzie, D R; Bilek, M M; Boswell, R W

    2005-01-01

    This paper presents the results of measurements carried out on plasmas created in five different RF discharge systems. These systems all have two separately powered RF (13.56 MHz) electrodes, but differ in overall size and in the geometry of both vacuum chambers and RF electrodes or antennae. The two power supplies were synchronized with a phase-shift controller. We investigated the influence of the phase difference between the two RF electrodes on plasma parameters and compared the different system geometries. Single Langmuir probes were used to measure the plasma parameters in a region between the electrodes. Floating potential and ion density were affected by the phase difference and we found a strong influence of the system geometry on the observed phase difference dependence. Both ion density and floating potential curves show asymmetries around maxima and minima. These asymmetries can be explained by a phase dependence of the time evolution of the electrode-wall coupling within an RF-cycle resulting from the asymmetric system geometry

  5. A calibrated, broadband antenna for plasma RF emission measurements below 1 GHz

    International Nuclear Information System (INIS)

    Spence, P.D.; Rosenberg, D.; Roth, J.R.

    1984-01-01

    A constant impedance, constant aperture antenna can make possible broadband plasma RF emission measurements which yield relative and absolute power levels. However, good technique must be followed for the immersion of such an RF probe into plasma radiation. The authors have used a complementary conical spiral antenna to observe plasma RF emission over the frequency range 100 ≤ν≤ 1200 MHz. The RF emission was emitted by a modified Penning discharge. The RF emission from the discharge typically exhibits harmonic structure over a broad frequency range, necessitating a broadband antenna with a flat frequency response curve to allow detailed spectral analysis. The antenna consists of two metal strips of approximately uniform width wound helically on a cone made of Lexan plastic. Since the antenna is a balanced network, a balun is employed to make the transition to a 50-ohm coaxial line. The antenna feed method is critical in maintaining a uniform impedance network. Neglecting stray transmission line effects, the probe circuit for the frequency range 100 ≤ν≤ 500 MHz is 50 ohms due to the spectrum analyzer, paralleled by 291 ohms due to balun magnetization; the combination is fed by a 144 ohm probe aperture

  6. Formation of thermal eddies during rf heating of plasma

    International Nuclear Information System (INIS)

    Motley, R.W.; Hooke, W.M.; Anania, G.

    1979-07-01

    Moderate power (approx.1 kW) excitation of lower hybrid waves in a linear plasma column is found to increase the reflectivity of the phased waveguide exciter and to change the vertical position of the resonance cone. Probing of the plasma near the mouth of the waveguide reveals that the increased reflection results from an undulation in the plasma surface. We present evidence that this surface distortion is driven by thermal eddies associated with asymmetrical electron heating

  7. Oxygen functionalization of MWCNTs in RF-dielectric barrier discharge Ar/O2 plasma

    Science.gov (United States)

    Abdel-Fattah, E.; Ogawa, D.; Nakamura, K.

    2017-07-01

    The oxygenation of multi-wall carbon nanotubes (MWCNTs) was performed via a radio frequency dielectric barrier discharge (RF-DBD) in an Ar/{{\\text{H}}2}\\text{O} plasma mixture. The relative intensity of the Ar/{{\\text{O}}2} plasma species was characterized by optical emission spectroscopy (OES). The effects of treatment time, RF power and oxygen gas percentage on the chemical composition and surface morphology of MWCNTs were investigated by means of x-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy and field emission scanning electron microscopy (FE-SEM). The results of FTIR and XPS revealed the presence of oxygen-containing functional groups on the MWCNTs treated in an Ar/{{\\text{O}}2} plasma at an RF power of 50 W and pressure of 400 Pa. The amount of oxygen functional groups (C=O, C-O, and O-COO) also increased by increasing treatment time up to 6 min, but slightly decreased when treatment time was increased by 10 min. The increase of oxygen gas percentage in the plasma mixture does not affect the oxygen content in the treated MWCNTs. Meanwhile, MWCNTs treated at high power (80 W) showed a reduction in oxygen functional groups in comparison with low RF power conditions. The Raman analysis was consistent with the XPS and FTIR results. The integrity of the nanotube patterns also remained damaged as observed by FE-SEM images. The MWCNTs treated in RF-DBD using the Ar/{{\\text{O}}2} plasma mixture showed improved dispersibility in deionized water. A correlation between the OES data and the observed surface characterization for an improved understanding of the functionalization of MWCNTs in Ar/{{\\text{O}}2} plasma was presented.

  8. RF plasma parameter determination by a Langmuir multipoint double probe array

    International Nuclear Information System (INIS)

    Rojas-Olmedo, I A; López-Callejas, R; De la Piedad-Beneitez, A; Valencia-Alvarado, R; Peña-Eguiluz, R; Mercado-Cabrera, A; Barocio, S R; Muñoz-Castro, A E; Rodríguez-Méndez, B G

    2012-01-01

    A multipoint double Langmuir (MDL) probe system, which is exempt from interference, has been designed and assembled to be applied to an RF plasma. The system provides the measurement of fundamental plasma parameters such as density, temperature, plasma potential, etc. on the basis of the Bohm Approximation Theory and the Orbital Movement Limit. Thus, one pair of the MDL system is selected so as to consider the right plasma parameters within the prevailing pressure-power intervals. Both the hardware and software of the system have been applied to the modification of material properties by means of the PIII process.

  9. Study of Pulsed vs. RF Plasma Properties for Surface Processing Applications

    Science.gov (United States)

    Tang, Ricky; Hopkins, Matthew; Barnat, Edward; Miller, Paul

    2015-09-01

    The ability to manipulate the plasma parameters (density, E/N) was previously demonstrated using a double-pulsed column discharge. Experiments extending this to large-surface plasmas of interest to the plasma processing community were conducted. Differences between an audio-frequency pulsed plasma and a radio-frequency (rf) discharge, both prevalent in plasma processing applications, were studied. Optical emission spectroscopy shows higher-intensity emission in the UV/visible range for the pulsed plasma comparing to the rf plasma at comparable powers. Data suggest that the electron energy is higher for the pulsed plasma leading to higher ionization, resulting in increased ion density and ion flux. Diode laser absorption measurements of the concentration of the 1S5 metastable and 1S4 resonance states of argon (correlated with the plasma E/N) provide comparisons between the excitation/ionization states of the two plasmas. Preliminary modeling efforts suggest that the low-frequency polarity switch causes a much more abrupt potential variation to support interesting transport phenomena, generating a ``wave'' of higher temperature electrons leading to more ionization, as well as ``sheath capture'' of a higher density bolus of ions that are then accelerated during polarity switch.

  10. RF wave simulation for cold edge plasmas using the MFEM library

    Science.gov (United States)

    Shiraiwa, S.; Wright, J. C.; Bonoli, P. T.; Kolev, T.; Stowell, M.

    2017-10-01

    A newly developed generic electro-magnetic (EM) simulation tool for modeling RF wave propagation in SOL plasmas is presented. The primary motivation of this development is to extend the domain partitioning approach for incorporating arbitrarily shaped SOL plasmas and antenna to the TORIC core ICRF solver, which was previously demonstrated in the 2D geometry [S. Shiraiwa, et. al., "HISTORIC: extending core ICRF wave simulation to include realistic SOL plasmas", Nucl. Fusion in press], to larger and more complicated simulations by including a 3D realistic antenna and integrating RF rectified sheath potential model. Such an extension requires a scalable high fidelity 3D edge plasma wave simulation. We used the MFEM [http://mfem.org], open source scalable C++ finite element method library, and developed a Python wrapper for MFEM (PyMFEM), and then a radio frequency (RF) wave physics module in Python. This approach allows for building a physics layer rapidly, while separating the physics implementation being apart from the numerical FEM implementation. An interactive modeling interface was built on pScope [S Shiraiwa, et. al. Fusion Eng. Des. 112, 835] to work with an RF simulation model in a complicated geometry.

  11. Hydrogen and helium trapping in tungsten deposition layers formed by RF plasma sputtering

    International Nuclear Information System (INIS)

    Kazunari Katayama; Kazumi Imaoka; Takayuki Okamura; Masabumi Nishikawa

    2006-01-01

    Understanding of tritium behavior in plasma facing materials is an important issue for fusion reactor from viewpoints of fuel control and radiation safety. Tungsten is used as a plasma facing material in the divertor region of ITER. However, investigation of hydrogen isotope behavior in tungsten deposition layer is not sufficient so far. It is also necessary to evaluate an effect of helium on a formation of deposition layer and an accumulation of hydrogen isotopes because helium generated by fusion reaction exists in fusion plasma. In this study, tungsten deposition layers were formed by sputtering method using hydrogen and helium RF plasma. An erosion rate and a deposition rate of tungsten were estimated by weight measurement. Hydrogen and helium retention were investigated by thermal desorption method. Tungsten deposition was performed using a capacitively-coupled RF plasma device equipped with parallel-plate electrodes. A tungsten target was mounted on one electrode which is supplied with RF power at 200 W. Tungsten substrates were mounted on the other electrode which is at ground potential. The plasma discharge was continued for 120 hours where pressure of hydrogen or helium was controlled to be 10 Pa. The amounts of hydrogen and helium released from deposition layers was quantified by a gas chromatograph. The erosion rate of target tungsten under helium plasma was estimated to be 1.8 times larger than that under hydrogen plasma. The deposition rate on tungsten substrate under helium plasma was estimated to be 4.1 times larger than that under hydrogen plasma. Atomic ratio of hydrogen to tungsten in a deposition layer formed by hydrogen plasma was estimated to be 0.17 by heating to 600 o C. From a deposition layer formed by helium plasma, not only helium but also hydrogen was released by heating to 500 o C. Atomic ratios of helium and hydrogen to tungsten were estimated to be 0.080 and 0.075, respectively. The trapped hydrogen is probably impurity hydrogen

  12. Electromagnetic surface waves for large-area RF plasma productions between large-area planar electrodes

    International Nuclear Information System (INIS)

    Nonaka, S.

    1992-01-01

    Recently, large-area plasma production has been tested by means of a 13.56 MHz radio-frequency (RF) discharge between a pair of large-area planar electrodes, approximately 0.5 m x 1.4 m, as one of the semiconductor technologies for fabrication of large-area amorphous silicon solar cells in the ''Sunshine Project'' of the Agency of Industrial Science and Technology in Japan. We also confirmed long plasma production between a pair of long electrodes. In this paper, normal electromagnetic (EM) waves propagating in a region between a planar waveguide with one plasma and two dielectric layers are analyzed in order to study the feasibility of large-area plasma productions by EM wave-discharges between a pair of large-area RF electrodes larger than the half-wavelength of RF wave. In conclusion, plasmas higher than an electron plasma frequency will be produced by an odd TMoo surface mode. (author) 4 refs., 3 figs

  13. Concept Study of Radio Frequency (RF Plasma Thruster for Space Propulsion

    Directory of Open Access Journals (Sweden)

    Anna-Maria Theodora ANDREESCU

    2016-12-01

    Full Text Available Electric thrusters are capable of accelerating ions to speeds that are impossible to reach using chemical reaction. Recent advances in plasma-based concepts have led to the identification of electromagnetic (RF generation and acceleration systems as able to provide not only continuous thrust, but also highly controllable and wide-range exhaust velocities. For Future Space Propulsion there is a pressing need for low pressure, high mass flow rate and controlled ion energies. This paper explores the potential of using RF heated plasmas for space propulsion in order to mitigate the electric propulsion problems caused by erosion and gain flexibility in plasma manipulation. The main key components of RF thruster architecture are: a feeding system able to provide the required neutral gas flow, plasma source chamber, antenna/electrodes wrapped around the discharge tube and optimized electromagnetic field coils for plasma confinement. A preliminary analysis of system performance (thrust, specific impulse, efficiency is performed along with future plans of Space Propulsion based on this new concept of plasma mechanism.

  14. Mechanism of laser and rf plasma in vibrational nonequilibrium CO-N2 gas mixture

    International Nuclear Information System (INIS)

    Lou Guofeng; Adamovich, Igor V.

    2009-01-01

    This paper investigates the mechanism of plasma created by focused CO laser and rf electric field. The plasma is created in a CO/N 2 environment, at a total pressure of 600 torr. Ionization of the gases occurs by an associative ionization mechanism, in collisions of two highly vibrationally excited molecules. These highly vibrationally excited states are populated by resonance absorption of the CO radiation followed by anharmonic vibration-vibration (V-V) pumping. Moreover N 2 also becomes vibrationally excited due to collisions with vibrationally excited CO. The coupled rf reduced electric field E/N is sufficiently low to prevent electron impact ionization that may create plasma individually, so when a subbreakdown rf field is applied to the plasma, collisions between the free electrons heated by the field and the diatomic species create additional vibrational excitation both in the region occupied by the CO laser beam and outside of the laser beam region. The numerical results show plasma created in both regions (in and out of the CO laser beam region) with the associative ionization mechanism. This suggests a method for creating a stable nonequilibrium plasma. The calculation result is verified by comparison the synthetic spectrum to a measured one.

  15. Non-Equilibrium Modeling of Inductively Coupled RF Plasmas

    Science.gov (United States)

    2015-01-01

    wall can be approximated with the expression for an infinite solenoid , B(r = R) = µ0NIc, where quan- tities N and Ic are the number of turns per unit...Modeling of non-equilibrium plasmas in an induc- tively coupled plasma facility. AIAA Paper 2014– 2235, 2014. 45th AIAA Plasmadynamics and Lasers ...1993. 24th Plas- madynamics and Laser Conference, Orlando, FL. [22] M. Capitelli, I. Armenise, D. Bruno, M. Caccia- tore, R. Celiberto, G. Colonna, O

  16. Sensitivity of RF-driven Plasma Filaments to Trace Gases

    Science.gov (United States)

    Burin, M. J.; Czarnocki, C. J.; Czarnocki, K.; Zweben, S. J.; Zwicker, A.

    2011-10-01

    Filamentary structures have been observed in many types of plasma discharges in both natural (e.g. lightning) and industrial systems (e.g. dielectric barrier discharges). Recent progress has been made in characterizing these structures, though various aspects of their essential physics remain unclear. A common example of this phenomenon can be found within a toy plasma globe (or plasma ball), wherein a primarily neon gas mixture near atmospheric pressure clearly and aesthetically displays filamentation. Recent work has provided the first characterization of these plasma globe filaments [Campanell et al., Physics of Plasmas 2010], where it was noticed that discharges of pure gases tend not to produce filaments. We have extended this initial work to investigate in greater detail the dependence of trace gases on filamentation within a primarily Neon discharge. Our preliminary results using a custom globe apparatus will be presented, along with some discussion of voltage dependencies. Newly supported by the NSF/DOE Partnership in Basic Plasma Science and Engineering.

  17. RF Plasma Source for Heavy Ion Beam Charge Neutralization

    Science.gov (United States)

    Efthimion, P. C.; Gilson, E.; Grisham, L.; Davidson, R. C.

    2003-10-01

    Highly ionized plasmas are being employed as a medium for charge neutralizing heavy ion beams in order to focus to a small spot size. Calculations suggest that plasma at a density of 1 - 100 times the ion beam density and at a length 0.1-0.5 m would be suitable for achieving a high level of charge neutralization. An ECR source has been built at the Princeton Plasma Physics Laboratory (PPPL) in support of the joint Neutralized Transport Experiment (NTX) at the Lawrence Berkeley National Laboratory (LBNL) to study ion beam neutralization with plasma. The ECR source operates at 13.6 MHz and with solenoid magnetic fields of 0-10 gauss. The goal is to operate the source at pressures 10-5 Torr at full ionization. The initial operation of the source has been at pressures of 10-4 - 10-1 Torr. Electron densities in the range of 10^8 - 10^11 cm-3 have been achieved. Recently, pulsed operation of the source has enabled operation at pressures in the 10-6 Torr range with densities of 10^11 cm-3. Near 100% ionization has been achieved. The source has been integrated with NTX and is being used in the experiments. The plasma is approximately 10 cm in length in the direction of the beam propagation. Modifications to the source will be presented that increase its length in the direction of beam propagation.

  18. RF heating of currentless plasma in Heliotron E

    International Nuclear Information System (INIS)

    Iiyoshi, A.; Motojima, O.; Sato, M.

    1985-01-01

    Recent electron cyclotron resonance heating (ECRH) and ion cyclotron range frequency heating (ICRF) experiments performed with a current-free plasma in Heliotron E are described. Parametric studies of ECRH are in progress. For both fundamental and second-harmonic resonances, optimum heating is observed when the plasma density is near the cutoff density (for the ordinary wave, in the case of fundamental resonance and for the extraordinary wave, in the case of second-harmonic resonance) and when a resonance zone exists on the magnetic axis. The maximum heating efficiencies for the fundamental and second-harmonic resonances are 6.5 eV.kW -1 per 10 19 m -3 and 2.4 eV.kW -1 per 10 19 m -3 , respectively. The ray-tracing analysis agrees qualitatively well with the experimental results. The power dependences of the plasma parameters are also investigated. - The first ICRF experiment with fast-wave heating of a current-free plasma has been performed. The ICRF wave power and pulse length are 550 kW and 15 ms, respectively. The frequency is 26.7 MHz. Ions and electrons are heated effectively. The increase in ion temperature is only slightly changed by varying the hydrogen ratio of the gas puff. On the other hand, the electron temperature increase has a definite peak for a high proton ratio (approx. 15%). This agrees qualitatively with the mode conversion picture of minority heating. (author)

  19. Multi-diversity combining and selection for relay-assisted mixed RF/FSO system

    Science.gov (United States)

    Chen, Li; Wang, Weidong

    2017-12-01

    We propose and analyze multi-diversity combining and selection to enhance the performance of relay-assisted mixed radio frequency/free-space optics (RF/FSO) system. We focus on a practical scenario for cellular network where a single-antenna source is communicating to a multi-apertures destination through a relay equipped with multiple receive antennas and multiple transmit apertures. The RF single input multiple output (SIMO) links employ either maximal-ratio combining (MRC) or receive antenna selection (RAS), and the FSO multiple input multiple output (MIMO) links adopt either repetition coding (RC) or transmit laser selection (TLS). The performance is evaluated via an outage probability analysis over Rayleigh fading RF links and Gamma-Gamma atmospheric turbulence FSO links with pointing errors where channel state information (CSI) assisted amplify-and-forward (AF) scheme is considered. Asymptotic closed-form expressions at high signal-to-noise ratio (SNR) are also derived. Coding gain and diversity order for different combining and selection schemes are further discussed. Numerical results are provided to verify and illustrate the analytical results.

  20. Ion irradiation effects on ionic liquids interfaced with rf discharge plasmas

    International Nuclear Information System (INIS)

    Baba, K.; Kaneko, T.; Hatakeyama, R.

    2007-01-01

    The availability of plasma ion irradiation toward a gas-liquid interface is investigated in a rf discharge system incorporating an ionic liquid. The introduction of the ionic liquid to the plasma causes the formation of a sheath electric field on the ionic liquid surface, resulting in the acceleration of the ions to the ionic liquid and the generation of secondary electrons from the ionic liquid by the ion irradiation. These effects are found to advance the discharge process and enhance the plasma production

  1. Metal doped fluorocarbon polymer films prepared by plasma polymerization using an RF planar magnetron target

    International Nuclear Information System (INIS)

    Biederman, H.; Holland, L.

    1983-01-01

    Fluorocarbon films have been prepared by plasma polymerization of CF 4 using an RF planar magnetron with an aluminium target. More than one order of magnitude higher deposition rate has been achieved in comparison with an r.f. diode system operated under similar conditions of monomer pressure and flow rate and power input. A glow discharge in a CF 4 [25%]-argon[75%] mixture was used to incorporate aluminium from a target electrode into the polymer films. The foregoing mixture and another based on CF 4 [87%]-argon[13%] were used in the RF discharge with a copper target. Some experiments with a gold target and pure CF 4 as the inlet gas were also made. The film structure was examined by SEM and TEM and characteristic micrographs are presented here. The composition of the films was estimated from an EAS study. The sheet resistivity of the metal/polymer film complexes was determined. (orig.)

  2. Preparation procedure for spherical titanium powders by RF induction plasma

    International Nuclear Information System (INIS)

    Gu Zhongtao; Jin Yuping; Ye Gaoying

    2011-01-01

    The paper uses the single-factor method for the study of spherical titanium powder preparation process. Titanium powders with excellent sphericity can be prepared through controlling and regulating the radio frequency plasma anode working current and voltage, central gas flow rate, sheath gas flow rate, powder-carrying gas flow rate, negative ventilation pressure and powder feed rate, etc. Spheroidization of titanium powders with a size of (17.0±2.0) μm is performed by radio frequency plasma technology. With the increase of negative ventilation pressure, the spheroidization rate of titanium powders increases firstly and then decreases rapidly at the turning point around 1800 Pa. With the rate of powder feed increasing, the spheroidization rate of titanium powders increases firstly. When the powder feed rate is greater than 90.0 g/min, the spheroidization rate of titanium powders reduces rapidly as the powder feed rate increases. (authors)

  3. An RF heated tandem mirror plasma propulsion study

    Science.gov (United States)

    Yang, T. F.; Yao, X.; Peng, S.; Krueger, W. A.; Chang-Diaz, F. R.

    1989-01-01

    Experimental results on a tandem mirror hybrid plume rocket involving a three-stage system of plasma injection, heating, and subsequent injection through a magnetic nozzle are presented. In the experiments, a plasma is created by breaking down the gas with electron cyclotron resonance heating at 2 kW in the central cell, and the ion species is then heated to high temperatures with ion cyclotron resonance heating at 10 kW in the end cell. A Langmuir probe measured an electron density of 2.5 x 10 to the 16th/cu m and a temperature of 100 eV in the central cell and an ion density of 1.25 x 10 to the 17th/cu m and a temperature of 500 eV in the end cell.

  4. High power RF heating and nonthermal distributions in tokamak plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Peeters, A.G.

    1994-12-13

    This thesis discusses the nonthermal effects in the electron population of a tokamak, that are generated by the inductive electric field and electron cyclotron resonant heating. The kinetic description of the plasma is given by a Boltzmann equation for the electron velocity distribution, in which the many small angle scattering Coulomb collisions that occur in the plasma are modelled by a Fokker-Planck collision term. These collisions drive the distribution towards the Maxwellian distribution of thermodynamic equilibrium. The energy absorption from the electron cyclotron waves and the acceleration by the toroidal electric field lead to deviations from the Maxwellian destribution. The interaction of the electron cyclotron waves with the plasma is treated within quasilinear theory. Resonant interaction occurs when the wave frequency matches one of the harmonics of the gyration frequency of the electrons in the static magnetic field. The waves generate a diffusion of resonant electrons in velocity space. The inductive electric field accelerates the electrons in the direction prallel to the magnetic field and leads to a convection in velocity space. The equilibrium that is reached between the driving forces of the electric field and the electron cyclotron waves and the restoring force of the collisions is studied in this thesis. The specific geometry of the tokamak is incorporated in the model through an average of the kinetic equation over the electron orbits. (orig./WL).

  5. High power RF heating and nonthermal distributions in tokamak plasmas

    International Nuclear Information System (INIS)

    Peeters, A.G.

    1994-01-01

    This thesis discusses the nonthermal effects in the electron population of a tokamak, that are generated by the inductive electric field and electron cyclotron resonant heating. The kinetic description of the plasma is given by a Boltzmann equation for the electron velocity distribution, in which the many small angle scattering Coulomb collisions that occur in the plasma are modelled by a Fokker-Planck collision term. These collisions drive the distribution towards the Maxwellian distribution of thermodynamic equilibrium. The energy absorption from the electron cyclotron waves and the acceleration by the toroidal electric field lead to deviations from the Maxwellian destribution. The interaction of the electron cyclotron waves with the plasma is treated within quasilinear theory. Resonant interaction occurs when the wave frequency matches one of the harmonics of the gyration frequency of the electrons in the static magnetic field. The waves generate a diffusion of resonant electrons in velocity space. The inductive electric field accelerates the electrons in the direction prallel to the magnetic field and leads to a convection in velocity space. The equilibrium that is reached between the driving forces of the electric field and the electron cyclotron waves and the restoring force of the collisions is studied in this thesis. The specific geometry of the tokamak is incorporated in the model through an average of the kinetic equation over the electron orbits. (orig./WL)

  6. The Efficiency of Quartz Particles Evaporation in the Argon Plasma Flow of the RF Inductively Coupled Plasma Torch

    Directory of Open Access Journals (Sweden)

    Yu. M. Grishin

    2017-01-01

    Full Text Available Owing to high-power density and high-purity plasma, a RF inductively coupled plasma torch (ICPT is widely used both in research laboratory and in industry. The potential RF ICPT application areas are powders spheroidisation, waste treatment, thermal spraying, etc.In the last decade the investigation was focused on the treatment processes of quartz into polycrystalline silicon. An analysis of these results has shown that the increasing productivity and producing high-purity silicon can be achieved only when using the electrodeless radio-frequency induction plasma torches and in case the optimum conditions for evaporation of SiO2solid particles are realized.Optimization of the RF ICPT design and power parameters calls for a wide range of computational studies. In spite of the fact that to date a large number of efforts to calculate the evaporation efficiency of powder materials have been made, a number of issues, as applied to the problem of obtaining silicon, require further research.In this paper, we present the results of a two-dimensional numerical simulation of the heating and evaporation of quartz particles in the RF ICPT channel with axial flow of gases. The main aim is to determine how the axial position of the central tube (through which the particles are injected into the discharge zone, the dispersion of the quartz powder, the amplitude of the discharge current (and, respectively, flow regimes impact on the evaporation efficiency of quartz particles.The paper presented the numerical modeling results of heating and evaporation processes of quartz particles supplied by transporting gas to the RF ICPT channel with axial gas flow (argon. Defined the impact of the axial position of the central tube, the plasma flow regime, the discharge current, the flow rate of transporting gas, and other parameters on the evaporation efficiency of quartz particles.It is shown that the evaporation efficiency of particles reaches its maximum when their

  7. Study of RF-excited Diethylene Glycol Dimethyl Ether Plasmas by Mass Spectrometry

    International Nuclear Information System (INIS)

    Algatti, M A; Mota, R P; Júnior, P W P Moreira; Honda, R Y; Kayama, M E; Kostov, K G

    2012-01-01

    This paper deals with the study of the fragmentation process of diethylene glycol dimethyl ether (CH 3 O(CH 2 CH 2 O) 2 CH 3 ) (diglyme here in) molecule in low pressure RF excited plasma discharges. The study was carried out using mass spectrometry. The results showed that for a fixed pressure, the increase of the RF power coupled to the plasma chamber from 1 to 35 W produced a plasma environment much more reactive which increases the population of the ionized species like CH 2 + (15 amu), C 2 H 4 + (28 amu), CH 3 O + (31 amu), C 2 H 4 O + (44 amu), CH 3 OCH 2 CH 2 + (59 amu) and CH 3 OCH 2 CH 2 O + (75 amu). This fact may be attributed to the increase of the electronic temperature that makes predominant the occurrence of inelastic processes that promotes molecular fragmentation. For a fixed value of RF power the increase of pressure from 50 mTorr to 100 mTorr produces the decreasing of the above mentioned chemical species due the lower electronic mean free path. These results suggest that if one wants to keep the monomer's functionality within the plasma deposited films resulting from such kind of discharges one must operate in low power conditions.

  8. RF-assisted current startup in the fusion engineering device (FED)

    International Nuclear Information System (INIS)

    Borowski, S.K.; Peng, Y-K.M.; Kammash, T.

    1982-01-01

    Auxiliary rf heating of electrons before and during the current rise phase in FED is examined as a means of reducing both the initiation loop voltage and resistive flux expenditure during startup. Prior to current initiation 1 to 2 MW of electron cyclotron resonance heating (ECRH) power at --90 GHz is used to create a small volume of high conductivity plasma (Tsub(e) asymptoticaly equals 100 eV, nsub(e) asymptoticaly equals 10 13 cm 3 ) near the upper hybrid resonance (UHR) region. This plasma conditioning permits a small radius (asub(o) asymptoticaly equals 0.2 - 0.4 m) current channel to be established with a relatively low initial loop voltage (<=25 V). During the subsequent plasma expansion and current ramp phase, additional rf power is introduced to reduce volt-second consumption due to plasma resistance. A near classical particle and energy transport model has been developed to estimate the efficiency of electron heating in a currentless, toroidal plasma. The model assumes that MHD instabilities are absent due to the presence of an ambipolar sheath potential and a conducting limiter and vacuum vessel which ''short-circuits'' the vertical charge separation. Preferential electron heating at the UHR leads to the formation of an ambipolar electric field (Esub( a m b)) at the conducting vessel and limiter, which introduces an effective rotational transform via poloidal E vectorsub( a m b) x B vector drift. This drift improves particle confinement and enables the plasma to neutralize itself. The benefits of this effective electrostatic confinement are tempered; however, by the possibility of significant secondary electron emission from the limiters and vessel wall. Reasonable good agreement has been found between our theoretical estimates and the measurements made during ECR preheating experiments on the ISX-B tokamak. This agreement provides some confidence in the preheating power estimates obtained for the FED. (author)

  9. Plasma assisted combustion of parafin mixture

    International Nuclear Information System (INIS)

    Nedybaliuk, O.A.; Chernyak, V.Ya.; Martysh, E.V.; Lisitchenko, T.E.; Vergun, O.Yu.; Orlovska, S.G.

    2013-01-01

    In this work the results of solid paraffin combustion with the aid of the plasma of transverse and rotational gliding arc studies are represented. The question of the additional activation of paraffin based solid fuels is examined. The mixture of n-paraffin and stearin in the solid state as the model of the solid paraffin based fuel is used. The plasma assisted combustion of this model is experimentally investigated. The voltage-current characteristics of discharge at the different regimes are measured. The population temperatures of excited rotational levels are determined. The flame temperature during the combustion of solid paraffin containing mixture is calculated

  10. EM Modelling of RF Propagation Through Plasma Plumes

    Science.gov (United States)

    Pandolfo, L.; Bandinelli, M.; Araque Quijano, J. L.; Vecchi, G.; Pawlak, H.; Marliani, F.

    2012-05-01

    Electric propulsion is a commercially attractive solution for attitude and position control of geostationary satellites. Hall-effect ion thrusters generate a localized plasma flow in the surrounding of the satellite, whose impact on the communication system needs to be qualitatively and quantitatively assessed. An electromagnetic modelling tool has been developed and integrated into the Antenna Design Framework- ElectroMagnetic Satellite (ADF-EMS). The system is able to guide the user from the plume definition phases through plume installation and simulation. A validation activity has been carried out and the system has been applied to the plume modulation analysis of SGEO/Hispasat mission.

  11. Efficient cesiation in RF driven surface plasma negative ion source

    Energy Technology Data Exchange (ETDEWEB)

    Belchenko, Yu.; Ivanov, A.; Konstantinov, S.; Sanin, A., E-mail: sanin@inp.nsk.su; Sotnikov, O. [Budker Institute of Nuclear Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk (Russian Federation)

    2016-02-15

    Experiments on hydrogen negative ions production in the large radio-frequency negative ion source with cesium seed are described. The system of directed cesium deposition to the plasma grid periphery was used. The small cesium seed (∼0.5 G) provides an enhanced H{sup −} production during a 2 month long experimental cycle. The gradual increase of negative ion yield during the long-term source runs was observed after cesium addition to the source. The degraded H{sup −} production was recorded after air filling to the source or after the cesium washing away from the driver and plasma chamber walls. The following source conditioning by beam shots produces the gradual recovery of H{sup −} yield to the high value. The effect of H{sup −} yield recovery after cesium coverage passivation by air fill was studied. The concept of cesium coverage replenishment and of H{sup −} yield recovery due to sputtering of cesium from the deteriorated layers is discussed.

  12. Frequency threshold for ion beam formation in expanding RF plasma

    Science.gov (United States)

    Chakraborty Thakur, Saikat; Harvey, Zane; Biloiu, Ioana; Hansen, Alex; Hardin, Robert; Przybysz, William; Scime, Earl

    2008-11-01

    We observe a threshold frequency for ion beam formation in expanding, low pressure, argon helicon plasma. Mutually consistent measurements of ion beam energy and density relative to the background ion density obtained with a retarding field energy analyzer and laser induced fluorescence indicate that a stable ion beam of 15 eV appears for source frequencies above 11.5 MHz. Reducing the frequency increases the upstream beam amplitude. Downstream of the expansion region, a clear ion beam is seen only for the higher frequencies. At lower frequencies, large electrostatic instabilities appear and an ion beam is not observed. The upstream plasma density increases sharply at the same threshold frequency that leads to the appearance of a stable double layer. The observations are consistent with the theoretical prediction that downstream electrons accelerated into the source by the double layer lead to increased ionization, thus balancing the higher loss rates upstream [1]. 1. M. A. Lieberman, C. Charles and R. W. Boswell, J. Phys. D: Appl. Phys. 39 (2006) 3294-3304

  13. Time-resolved measurements of highly-polymerised negative ions in rf silane plasma deposition experiments

    International Nuclear Information System (INIS)

    Howling, A.A.; Sansonnens, L.; Dorier, J.L.; Hollenstein, C.

    1993-07-01

    The time-resolved fluxes of negative polysilicon hydride ions from a power-modulated rf silane plasma have been measured by quadrupole mass spectrometry and modeled using a simple polymerisation scheme. Experiments were performed with plasma parameters suitable for high-quality amorphous silicon deposition. Polysilicon hydride anions diffuse from the plasma with low energy (approximately 0.5 eV) during the afterglow after the electron density has decayed and the sheath fields have collapsed. The mass-dependence of the temporal behavior of the anion loss flux demonstrates that the plasma composition is influenced by the modulation frequency. The negative species attain much higher masses than the positive or neutral species, and anions containing as many as sixteen silicon atoms have been observed, corresponding to the 500 amu limit of the mass spectrometer. This suggests that negative ions could be the precursors to particle formation. Ion-molecule and ion-ion reactions are discussed and a simple negative ion polymerisation scheme is proposed which qualitatively reproduces the experimental results. The model shows that the densities of high mass negative ions in the plasma are strongly reduced by modulation frequencies near 1 kHz. Each plasma period is then too short for the polymerisation chain to propagate to high masses before the elementary anions are lost in each subsequent afterglow period. This explains why modulation of the rf power can reduce particle contamination. We conclude that, for the case of silane rf plasmas, the initiation steps which ultimately lead to particle contamination proceed by negative ion polymerisation. (author) 15 figs., 72 refs

  14. Simulation of rarefied low pressure RF plasma flow around the sample

    International Nuclear Information System (INIS)

    Zheltukhin, V S; Shemakhin, A Yu

    2017-01-01

    The paper describes a mathematical model of the flow of radio frequency plasma at low pressure. The hybrid mathematical model includes the Boltzmann equation for the neutral component of the RF plasma, the continuity and the thermal equations for the charged component. Initial and boundary conditions for the corresponding equations are described. The electron temperature in the calculations is 1-4 eV, atoms temperature in the plasma clot is (3-4) • 10 3 K, in the plasma jet is (3.2-10) • 10 2 K, the degree of ionization is 10 -7 -10 -5 , electron density is 10 15 -10 19 m -3 . For calculations plasma parameters is developed soft package on C++ program language, that uses the OpenFOAM library package. Simulations for the vacuum chamber in the presence of a sample and the free jet flow were carried out. (paper)

  15. Simulation of rarefied low pressure RF plasma flow around the sample

    Science.gov (United States)

    Zheltukhin, V. S.; Shemakhin, A. Yu

    2017-01-01

    The paper describes a mathematical model of the flow of radio frequency plasma at low pressure. The hybrid mathematical model includes the Boltzmann equation for the neutral component of the RF plasma, the continuity and the thermal equations for the charged component. Initial and boundary conditions for the corresponding equations are described. The electron temperature in the calculations is 1-4 eV, atoms temperature in the plasma clot is (3-4) • 103 K, in the plasma jet is (3.2-10) • 102 K, the degree of ionization is 10-7-10-5, electron density is 1015-1019 m-3. For calculations plasma parameters is developed soft package on C++ program language, that uses the OpenFOAM library package. Simulations for the vacuum chamber in the presence of a sample and the free jet flow were carried out.

  16. Styrene and methyl methacrylate copolymer synthesized by RF inductively coupled plasma

    Energy Technology Data Exchange (ETDEWEB)

    Li, Z; Gillon, X; Diallo, M; Houssiau, L; Pireaux, J-J, E-mail: zhiling.li@fundp.ac.be [University of Namur (FUNDP) Research Centre in Physics of Matter and Radiation (PMR), 61, Rue de Bruxelles, 5000 Namur (Belgium)

    2011-01-01

    A series of random copolymers of styrene and methyl methacrylate was prepared on a silicon substrate by RF pulsed inductively coupled plasma. The plasma gas phase was investigated by optical emission spectroscopy (OES). The physico-chemical characteristics of the deposited copolymer films were analyzed by several surface techniques: X-ray photoelectron spectroscopy (XPS), Fourier-Transform infrared absorption (FT-IR), Time-of-flight secondary ion mass spectrometry (ToF-SIMS), etc. OES of the plasma and FT-IR spectra of the films are predictive: plasma emitting a higher relative benzyl radical signal results in the deposition of a more aromatic plasma polymer. The functional thin films can be deposited by selection of the co-monomers.

  17. Plasma processing of large curved surfaces for superconducting rf cavity modification

    Directory of Open Access Journals (Sweden)

    J. Upadhyay

    2014-12-01

    Full Text Available Plasma-based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF cavities. We have demonstrated surface layer removal in an asymmetric nonplanar geometry, using a simple cylindrical cavity. The etching rate is highly correlated with the shape of the inner electrode, radio-frequency (rf circuit elements, gas pressure, rf power, chlorine concentration in the Cl_{2}/Ar gas mixtures, residence time of reactive species, and temperature of the cavity. Using variable radius cylindrical electrodes, large-surface ring-shaped samples, and dc bias in the external circuit, we have measured substantial average etching rates and outlined the possibility of optimizing plasma properties with respect to maximum surface processing effect.

  18. Pyrolysis treatment of waste tire powder in a capacitively coupled RF plasma reactor

    Energy Technology Data Exchange (ETDEWEB)

    Huang, H. [Department of Environmental Engineering, Guangdong University of Technology, Waihuanxi Road, Guangzhou 510006 (China); Tang, L. [Department of Civil Engineering, Guangzhou University, Waihuanxi Road, Guangzhou 510006 (China)

    2009-03-15

    A capacitively coupled radio-frequency (RF) plasma reactor was tested mainly for the purpose of solid waste treatment. It was found that using a RF input power between 1600 and 2000 W and a reactor pressure between 3000 and 8000 Pa (absolute pressure), a reactive plasma environment with a gas temperature between 1200 and 1800 K can be reached in this lab scale reactor. Under these conditions, pyrolysis of tire powder gave two product streams: a combustible gas and a pyrolytic char. The major components of the gas product are H{sub 2}, CO, CH{sub 4}, and CO{sub 2} The physical properties (surface area, porosity, and particle morphology) as well as chemical properties (elemental composition, heating value, and surface functional groups) of the pyrolytic char has also been examined. (author)

  19. Aging and its circumvention in rf-plasma oxidized Pb-alloy Josephson junctions

    International Nuclear Information System (INIS)

    Wada, M.; Nakano, J.

    1987-01-01

    The aging phenomenon of Pb-alloy Josephson junctions is investigated and an effective method of circumventing it is presented. Junctions consist of Pb-alloy electrodes and a tunneling barrier formed by rf-plasma oxidation of the Pb-alloy. First, aging and annealing-driven change in normal tunneling resistance are compared to verify the usage of annealing as an experimental method for simulation and acceleration of aging. Next, process variables affecting the annealing change in junction characteristics are examined and their influence is described. The importance of the oxide-base electrode interface is confirmed and that of the counterelectrode-oxide interface is experimentally shown. Furthermore, possible changes in the oxide itself are discussed. Finally, on the basis of these studies, rf-plasma oxidation in a CO 2 atmosphere is employed and proven to be an effective method for circumventing the annealing change in the junction characteristics

  20. Influence of ECR-RF plasma modification on surface and thermal properties of polyester copolymer

    Directory of Open Access Journals (Sweden)

    Fray Miroslawa El

    2015-12-01

    Full Text Available In this paper we report a study on influence of radio-frequency (RF plasma induced with electron cyclotron resonance (ECR on multiblock copolymer containing butylene terephthalate hard segments (PBT and butylene dilinoleate (BDLA soft segments. The changes in thermal properties were studied by DSC. The changes in wettability of PBT-BDLA surfaces were studied by water contact angle (WCA. We found that ECR-RF plasma surface treatment for 60 s led to decrease of WCA, while prolonged exposure of plasma led to increase of WCA after N2 and N2O2 treatment up to 70°–80°. The O2 reduced the WCA to 50°–56°. IR measurements confirmed that the N2O2 plasma led to formation of polar groups. SEM investigations showed that plasma treatment led to minor surfaces changes. Collectively, plasma treatment, especially O2, induced surface hydrophilicity what could be beneficial for increased cell adhesion in future biomedical applications of these materials.

  1. Effects of rf power on electron density and temperature, neutral temperature, and Te fluctuations in an inductively coupled plasma

    International Nuclear Information System (INIS)

    Camparo, James; Fathi, Gilda

    2009-01-01

    Atomic clocks that fly on global-navigation satellites such as global positioning system (GPS) and Galileo employ light from low-temperature, inductively coupled plasmas (ICPs) for atomic signal generation and detection (i.e., alkali/noble-gas rf-discharge lamps). In this application, the performance of the atomic clock and the capabilities of the navigation system depend sensitively on the stability of the ICP's optical emission. In order to better understand the mechanisms that might lead to instability in these rf-discharge lamps, and hence the satellite atomic clocks, we studied the optical emission from a Rb/Xe ICP as a function of the rf power driving the plasma. Surprisingly, we found that the electron density in the plasma was essentially independent of increases in rf power above its nominal value (i.e., 'rf-power gain') and that the electron temperature was only a slowly varying function of rf-power gain. The primary effect of rf power was to increase the temperature of the neutrals in the plasma, which was manifested by an increase in Rb vapor density. Interestingly, we also found evidence for electron temperature fluctuations (i.e., fluctuations in the plasma's high-energy electron content). The variance of these fluctuations scaled inversely with the plasma's mean electron temperature and was consistent with a simple model that assumed that the total electron density in the discharge was independent of rf power. Taken as a whole, our results indicate that the electrons in alkali/noble-gas ICPs are little affected by slight changes in rf power and that the primary effect of such changes is to heat the plasma's neutral species.

  2. Simulation of spatially dependent excitation rates and power deposition in RF discharges for plasma processing

    International Nuclear Information System (INIS)

    Kushner, M.J.; Anderson, H.M.; Hargis, P.J.

    1985-01-01

    In low pressure, radio frequency (RF) discharges of the type used in plasma processing of semiconductor materials, the rate of electron impact excitation and energy transfer processes depends upon both the phase of the RF excitation and position in the discharge. Electron impact collisions create radicals that diffuse or drift to the surfaces of interest where they are adsorbed or otherwise react. To the extent that these radicals have a finite lifetime, their transport time from point of creation to surface of interest is an important parameter. The spatial dependence of the rate of the initial electron impact collisions is therefore also an important parameter. The power that sustains the discharge is coupled into the system by two mechanisms: a high energy e-beam component of the electron distribution resulting from electrons falling through or being accelerated by the sheaths, and by joule heating in the body of the plasma. In this paper, the authors discuss the spatial dependence of excitation rates and the method of power deposition iin RF discharges of the type used for plasma processing

  3. Rf-plasma synthesis of nanosize silicon carbide and nitride. Final report

    Energy Technology Data Exchange (ETDEWEB)

    Buss, R.J.

    1997-02-01

    A pulsed rf plasma technique is capable of generating ceramic particles of 10 manometer dimension. Experiments using silane/ammonia and trimethylchlorosilane/hydrogen gas mixtures show that both silicon nitride and silicon carbide powders can be synthesized with control of the average particle diameter from 7 to 200 nm. Large size dispersion and much agglomeration appear characteristic of the method, in contrast to results reported by another research group. The as produced powders have a high hydrogen content and are air and moisture sensitive. Post-plasma treatment in a controlled atmosphere at elevated temperature (800{degrees}C) eliminates the hydrogen and stabilizes the powder with respect to oxidation or hydrolysis.

  4. RF-heating and plasma confinement studies in HANBIT mirror device

    International Nuclear Information System (INIS)

    Kwon, M.; Bak, J.G.; Choh, K.K.

    2003-01-01

    HANBIT is a magnetic mirror confinement device. Recently, with almost finishing the first campaign for the basic system development, it started the second campaign for the high-temperature plasma confinement physics study in mirror configuration. Here, we introduce briefly the HANBIT device and report initial physics experiments results on RF-plasma heating and confinement in the simple mirror configuration. It appears that the discharge characteristics of HANBIT are quite different from those in other mirror devices, and an explanation is presented to clarify the difference. (author)

  5. Negative ion mass spectra and particulate formation in rf silane plasma deposition experiments

    International Nuclear Information System (INIS)

    Howling, A.A.; Dorier, J.L.; Hollenstein, C.

    1992-09-01

    Negative ions have been clearly identified in silane rf plasmas used for the deposition of amorphous silicon. Mass spectra were measured for monosilicon up to pentasilicon negative ion radical groups in power-modulated plasmas by means of a mass spectrometer mounted just outside the glow region. Negative ions were only observed over a limited range of power modulation frequency which corresponds to particle-free conditions. The importance of negative ions regarding particulate formation is demonstrated and commented upon. (author) 3 figs., 19 refs

  6. Removal of carbon contaminations by RF plasma generated reactive species and subsequent effects on optical surface

    Energy Technology Data Exchange (ETDEWEB)

    Yadav, P. K., E-mail: praveenyadav@rrcat.gov.in; Rai, S. K.; Modi, M. H.; Nayak, M.; Lodha, G. S. [Indus Synchrotron Utilization Division, Raja Ramanna Centre for Advanced Technology, Indore-452013 (India); Kumar, M.; Chakera, J. A.; Naik, P. A. [Laser Plasma Laboratory, Laser Plasma Division, Raja Ramanna Centre for Advanced Technology, Indore-452013 (India)

    2015-06-24

    Carbon contamination on optical elements is a serious issue in synchrotron beam lines for several decades. The basic mechanism of carbon deposition on optics and cleaning strategies are not fully understood. Carbon growth mechanism and optimized cleaning procedures are worldwide under development stage. Optimized RF plasma cleaning is considered an active remedy for the same. In present study carbon contaminated optical test surfaces (carbon capped tungsten thin film) are exposed for 30 minutes to four different gases, rf plasma at constant power and constant dynamic pressure. Structural characterization (thickness, roughness and density) of virgin samples and plasma exposed samples was done by soft x-ray (λ=80 Å) reflectivity measurements at Indus-1 reflectivity beam line. Different gas plasma removes carbon with different rate (0.4 to 0.65 nm /min). A thin layer 2 to 9 nm of different roughness and density is observed at the top surface of tungsten film. Ar gas plasma is found more suitable for cleaning of tungsten surface.

  7. Investigation of Inonotus obliquus (Pers. Pil. Extracts and Melanins after RF-plasma Treatment of Raw Material

    Directory of Open Access Journals (Sweden)

    O.Yu. Kuznetsova

    2016-03-01

    Full Text Available High-frequency capacitive discharge (RF plasma at low pressure was used as preliminary stage for the intensification of extraction from natural medicinal raw material. RF-plasma treatment was carried out in two modes differed by the nature of plasma-forming gas. Chaga (Inonotus obliquus (Pers. Pil. known as the birch mushroom was selected as a perspective source of raw material. Extraction was carried out in two ways – remaceration and maceration. The analy-sis of chaga extracts and melanins was performed using traditional techniques including determination of physical and chemical, antioxidant and spectral characteristics. The obtained extracts and melanins were compared to the control samples and literature data. RF-plasma treatment of medicinal raw material increased the yield of extractive substances, in particular of the main active component of chaga – melanin. The antioxidant activity of chaga extracts grew, while for melanins it remained at the level similar to that of control samples. The IR spectral characteristics of the studied chaga melanins are similar and agree well with the literature data. Insignificant deviations in the position and intensity of absorption strips were observed for the samples after RF treatment. IR spectra of the studied chaga melanins are similar to those for mushroom melanins, thereby confirming the similarity in their nature. RF-plasma treatment of chaga medicinal raw materials allows to modify them partially. The structural and mechanical properties of melanins modified by RF plasma remain the same.

  8. RF-plasma vapor deposition of siloxane on paper. Part 1: Physical evolution of paper surface

    Science.gov (United States)

    Sahin, Halil Turgut

    2013-01-01

    An alternative, new approach to improve the hydrophobicity and barrier properties of paper was evaluated by radio-frequency (RF) plasma octamethylcyclotetrasiloxane (OMCTSO) vapor treatment. The interaction between OMCTSO and paper, causing the increased hydophobicity, is likely through covalent bonding. The deposited thin silicone-like polymeric layer from OMCTSO plasma treatment possessed desirable hydrophobic properties. The SEM micrographs showed uniformly distributed grainy particles with various shapes on the paper surface. Deposition of the silicone polymer-like layer with the plasma treatment affects the distribution of voids in the network structure and increases the barrier against water intake and air. The water absorptivity was reduced by 44% for the OMCTSO plasma treated sheet. The highest resistance to air flow was an approximately 41% lower air permeability than virgin paper.

  9. RF generated currents in a magnetized plasma using a slow wave structure

    International Nuclear Information System (INIS)

    Poole, B.R.; Cheo, B.R.; Kuo, S.P.; Tang, M.G.

    1983-01-01

    The generation of a dc current in a plasma by using RF waves is of importance for the operation of steadystate toroidal devices. An experimental investigation in the use of unidirectional, low frequency RF waves to drive currents has been made. Instead of using a natural plasma wave a slow wave guiding structure is used along the entire length of the plasma. When the RF wave is injected an increase in ionization and T/sub e/, and hence the background current is observed. However, the change depends on wave direction: The +k/sub z/ excitation yields a much larger electron current compared with the -k/sub z/ excitation indicating a net wave driven current. The measured modification in electron density and T/sub e/ is independent of wave direction. The current with a standing wave excitation generally falls at the average of the travelling wave (+ or - k/sub z/) driven currents. The net wave driven current is proportional to the feed power at approx. = 10 mA/kW. No saturation of the current is observed with feed powers up to 1 kW. Since the exciting structure is only 1 wavelength long, its k/sub z/ spectrum is relatively broad and hence no sharp resonances are observed as various plasma parameters and B/sub O/ are changed. There is no measurable difference between the power absorbed by the load resistors and the input power to the slow wave structure. Thus the current is driven by the wave field exclamation E exclamation 2 rather than the power absorbed in the plasma. The theoretical background and the physical mechanism is presented

  10. Design aspects of 13.56MHz, 1kW, CW-RF oscillator for plasma production

    International Nuclear Information System (INIS)

    Kumar, Sunil; Kadia, Bhavesh; Singh, Raj; Varia, Atul; Srinivas, Y S S; Kulkarni, S V

    2010-01-01

    RF produced plasma has many applications in plasma processing and also it is useful in studying the fundamental characteristics of the plasma. A 1KW RF Hartley oscillator is designed and tested at 13.56 MHz. This has been built at RF section of Institute for Plasma Research by using EIMAC (3CX1200A7) triode tube. The RF source is operated in the grounded cathode mode. Triode 3CX1200A7 is operated in class AB and the feedback is Cathode grounded. The tube has sufficient margin in terms of plate dissipation and Grid dissipation that makes it suitable to withstand momentarily load mismatch. To optimize the RF source along with HVDC power supply many mechanical and electrical aspects have been thought of to enhance the overall quality of the system. This source mainly has three sections (The RF section, HVDC Power supply and soft start Filament Power supply). The system is compact and is housed in a 80 cm x 60 cm x 1800 cm aluminum panel. This paper describes the specifications, design criteria, circuit used, operating parameters of 1KW Oscillator along with HVDC power supply with necessary interlocks, tests conducted and results obtained of this 1 KW grounded grid Hartley Oscillator on 50 ohm dummy load. This system has been tested for 8 hours of continuous operation without any appreciable deterioration of the RF output power.

  11. About of the Electrostatic fields excitation theory by a RF wave in a plasma

    International Nuclear Information System (INIS)

    Gutierrez T, C.R.

    1991-01-01

    In an unidimensional model is shown in the cases of a semi limited plasma and a layer of plasma the excitement mechanism of electrostatic fields for a radiofrequency wave (RF) polarized lineally. This phenomenon depends strongly on the combined action of the Miller force and that of impulsion. It is shown that the action of these forces is carried out in different characteristic times when the front of wave crosses through the plasma. The cases of a semi limited plasma and of a layer of plasma without and with current are analyzed. It is shown that near the frontiers of the plasma where the field is sufficiently big arise oscillations of the width of the field that are slowly muffled in the space in an exponential way. In the cases of a plasma layer its are shown that the processes that arise near the frontier x = L are similar to the processes that arise near the frontier x = 0. The existence of current in the plasma layer leads to the blockade of the excited perturbations in the frontier x = L. (Author)

  12. RF generator interlock by plasma grid bias current - An alternate to Hα interlock

    Science.gov (United States)

    Bandyopadhyay, M.; Gahlaut, A.; Yadav, R. K.; Pandya, K.; Tyagi, H.; Vupugalla, M.; Bhuyan, M.; Bhagora, J.; Chakraborty, A.

    2017-08-01

    ROBIN is inductively coupled plasma (ICP) based negative hydrogen ion source, operated with a 100kW, 1MHz Tetrode based RF generator (RFG). Inductive plasma ignition by the RFG in ROBIN is associated with electron seeding by a hot filament and a gas puff. RFG is triggered by the control system to deliver power just at the peak pressure of the gas puff. Once plasma is ignited due to proper impedance matching, a bright light, dominated by Hα (˜656nm wavelength) radiation is available inside RF driver which is used as a feedback signal to the RFG to continue its operation. If impedance matching is not correct, plasma is not produced due to lack of power coupling and bright light is not available. During such condition, reflected RF power may damage the RFG. Therefore, to protect the RFG, it needs to be switched off automatically within 200ms by the control system in such cases. This plasma light based RFG interlock is adopted from BATMAN ion source. However, in case of vacuum immersed RF ion source in reactor grade NBI system, such plasma light based interlock may not be feasible due to lack of adequate optical fiber interfaces. In reactor grade NBI system, neutron and gamma radiations have impact on materials which may lead to frequent maintenance and machine down time. The present demonstration of RFG interlock by Bias Current (BC) in ROBIN testbed gives an alternate option in this regard. In ROBIN, a bias plate (BP) is placed in the plasma chamber near the plasma grid (PG). BP is electrically connected to the plasma chamber wall of the ion source and PG is isolated from the wall. A high current ˜85 A direct current (DC) power supply of voltage in the range of 0 - 33V is connected between the PG and the BP in such a way that PG can be biased positively with respect to the BP or plasma chamber. This arrangement is actually made to absorb electrons and correspondingly reduce co-extracted electron current during beam extraction. However, in case of normal plasma

  13. Plasma flow around and charge distribution of a dust cluster in a rf discharge

    Science.gov (United States)

    Schleede, J.; Lewerentz, L.; Bronold, F. X.; Schneider, R.; Fehske, H.

    2018-04-01

    We employ a particle-in-cell Monte Carlo collision/particle-particle particle-mesh simulation to study the plasma flow around and the charge distribution of a three-dimensional dust cluster in the sheath of a low-pressure rf argon discharge. The geometry of the cluster and its position in the sheath are fixed to the experimental values, prohibiting a mechanical response of the cluster. Electrically, however, the cluster and the plasma environment, mimicking also the experimental situation, are coupled self-consistently. We find a broad distribution of the charges collected by the grains. The ion flux shows on the scale of the Debye length strong focusing and shadowing inside and outside the cluster due to the attraction of the ions to the negatively charged grains, whereas the electron flux is characterized on this scale only by a weak spatial modulation of its magnitude depending on the rf phase. On the scale of the individual dust potentials, however, the electron flux deviates in the vicinity of the cluster strongly from the laminar flow associated with the plasma sheath. It develops convection patterns to compensate for the depletion of electrons inside the dust cluster.

  14. Application of epifluorescence scanning for monitoring the efficacy of protein removal by RF gas-plasma decontamination

    International Nuclear Information System (INIS)

    Baxter, Helen C; Richardson, Patricia R; Campbell, Gaynor A; Jones, Anita C; Baxter, Robert L; Kovalev, Valeri I; Maier, Robert; Barton, James S; DeLarge, Greg; Casey, Mark

    2009-01-01

    The development of methods for measuring the efficiency of gas-plasma decontamination has lagged far behind application. An approach to measuring the efficiency of protein removal from solid surfaces using fluorescein-labelled bovine serum albumin and epifluorescence scanning (EFSCAN) is described. A method for fluorescently labelling proteins, which are adsorbed and denatured on metal surfaces, has been developed. Both approaches have been used to evaluate the efficiency of radio frequency (RF) gas-plasma decontamination protocols. Examples with 'real' surgical instruments demonstrate that an argon-oxygen RF gas-plasma treatment can routinely reduce the protein load by about three orders of magnitude beyond that achieved by current decontamination methods.

  15. Plasma polymer films rf sputtered from PTFE under various argon pressures

    Czech Academy of Sciences Publication Activity Database

    Stelmashuk, Vitaliy; Biederman, H.; Slavinská, D.; Zemek, Josef; Trchová, Miroslava

    2005-01-01

    Roč. 77, č. 2 (2005), s. 131-137 ISSN 0042-207X R&D Projects: GA MŠk(CZ) OC 527.10; GA MŠk(CZ) OC 527.90 Grant - others:EUREKAΣ2080(XE) OE57 Institutional research plan: CEZ:AV0Z10100521; CEZ:AV0Z20430508 Keywords : RF sputtering * PTFE * fluorcarbon plasma polymers * thin film * teflon * deposition Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 0.909, year: 2005

  16. Mechanism for heating of nitrogen plasmas in an electrodeless rf capacitive discharge at medium pressures

    International Nuclear Information System (INIS)

    Berdichevskii, M.G.; Marusin, V.V.

    1979-01-01

    The possible contributions of several processes to the experimentally observed heating of nitrogen plasmas in an electarodeless rf capacitive discharge at pressures of p=2.7-67 kPa are discussed. These processes are electron-rotational, vibrational--translational (V--T), and nonresonance vibrational--vibrational (V--V) energy exchange and effects due to O 2 , H 2 O, and NO impurities in the gas. It is shown that as the pressure is decreased the heating mechanism changes from quasiequilibrium to nonequilibrium V--T heating caused by overpopulation of high vibrational levels in the ground state of the nitrogen molecule

  17. Development of an rf-driven plasma neutralizer for negative ions

    International Nuclear Information System (INIS)

    Moses, K.G.

    1989-01-01

    The assertion that beams of negative ions can be neutralized more efficiently by impacting a plasma, rather than a cold gas target, is confirmed scientifically by the work of K.H. Berkner et al. What remains to be done is the realization of practical means of generating plasmas efficiently with appropriate integrated line densities (target thickness). The work performed by JAYCOR, under this grant, over the past few years has made significant progress towards that goal. In this work, large volumes of plasma are generated using low-frequency pulsed inductive rf discharges within a ring cusp multipole-magnetic field geometry. These plasmas exhibit sufficient line-integrated electron densities and degrees of ionization to neutralize beams of energetic negative ions whose energies exceed 500 keV. The method of plasma generation and the cell configuration used in these studies are directly applicable to higher energy neutral beam injector systems (NBIS). Innate scalability and modularity of the system design facilitates linear stacking to achieve a desired target thickness. Further, the plasma formation process is accomplished with an electrical economy consistent with increased overall electrical efficiency of the NBIS compared to that possible using a cold gas target. 5 refs., 16 figs

  18. RF plasma production and heating below ion-cyclotron frequencies in Uragan torsatrons

    International Nuclear Information System (INIS)

    Moiseenko, V.E.; Berezhnyj, V.L.; Bondarenko, V.N.; Burchenko, P.Ya.; Chechkin, V.V.; Chernyshenko, V.Ya.; Dreval, M.B.; Garkusha, I.E.; Glazunov, G.P.; Grigor'eva, L.I.; Konovalov, V.G.; Kotsubanov, V.D.; Kramskoi, Ye.D.; Kulaga, A.E.; Lozin, A.V.; Castejon, F.; Hidalgo, C.; Hartmann, D.; Koch, R.; Lyssoivan, A.I.

    2011-01-01

    In the IPP-Kharkiv there are two torsatrons (stellarators) in operation, and in both of them Alfven resonance heating under high-k || conditions is used. This method of heating is advantageous for small-size devices, since in contrast to the minority and second-harmonic heating it can be realized at lower plasma densities. A series of experiments has been performed at the Uragan-3M torsatron with an aim to investigate the features of the discharge with a three-half-turn antenna. Electron temperatures in the T-bar = 0.2-0.5 keV range are achieved at plasma densities n-bar e approx. (0.5-1.5) x 10 13 cm -3 . The plasma energy content has increased by a factor of 2 with respect to the plasma produced with the frame antenna. A new four-strap shielded antenna has been manufactured and installed in the Uragan-2M. A high-frequency discharge for wall conditioning is introduced in the Uragan-2M torsatron. The discharge is sustained by a specially designed small frame antenna, and efficient hydrogen dissociation is achieved. A self-consistent model has been developed for simulation of plasma production in ICRF. The model includes a set of particle and energy-balance equations for the electrons, and the boundary problem for the Maxwell equations. The first calculation results on RF plasma production in the Uragan-2M stellarator with the frame-type antenna are presented.

  19. Effects of RF plasma treatment on spray-pyrolyzed copper oxide films on silicon substrates

    Science.gov (United States)

    Madera, Rozen Grace B.; Martinez, Melanie M.; Vasquez, Magdaleno R., Jr.

    2018-01-01

    The effects of radio-frequency (RF) argon (Ar) plasma treatment on the structural, morphological, electrical and compositional properties of the spray-pyrolyzed p-type copper oxide films on n-type (100) silicon (Si) substrates were investigated. The films were successfully synthesized using 0.3 M copper acetate monohydrate sprayed on precut Si substrates maintained at 350 °C. X-ray diffraction revealed cupric oxide (CuO) with a monoclinic structure. An apparent improvement in crystallinity was realized after Ar plasma treatment, attributed to the removal of residues contaminating the surface. Scanning electron microscope images showed agglomerated monoclinic grains and revealed a reduction in size upon plasma exposure induced by the sputtering effect. The current-voltage characteristics of CuO/Si showed a rectifying behavior after Ar plasma exposure with an increase in turn-on voltage. Four-point probe measurements revealed a decrease in sheet resistance after plasma irradiation. Fourier transform infrared spectral analyses also showed O-H and C-O bands on the films. This work was able to produce CuO thin films via spray pyrolysis on Si substrates and enhancement in their properties by applying postdeposition Ar plasma treatment.

  20. Metal doped fluorocarbon polymer films prepared by plasma polymerization using an RF planar magnetron target

    Energy Technology Data Exchange (ETDEWEB)

    Biederman, H.; Holland, L. (Sussex Univ., Brighton (UK). Lab. for Plasma Materials Processing)

    1983-07-01

    Fluorocarbon films have been prepared by plasma polymerization of CF/sub 4/ using an RF planar magnetron with an aluminium target. More than one order of magnitude higher deposition rate has been achieved in comparison with an R.F. diode system operated under similar conditions of monomer pressure and flow rate and power input. A glow discharge in a CF/sub 4/(25%)-argon(75%) mixture was used to incorporate aluminium from a target electrode into the polymer films. The foregoing mixture and another based on CF/sub 4/(87%)-argon(13%) were used in the RF discharge with a copper target. Some experiments with a gold target and pure CF/sub 4/ as the inlet gas were also made. The film structure was examined by SEM and TEM and characteristic micrographs are presented here. The composition of the films was estimated from an EAS study. The sheet resistivity of the metal/polymer film complexes was determined.

  1. Modeling of polarization phenomena due to RF sheaths and electron beams in magnetized plasma

    International Nuclear Information System (INIS)

    Faudot, E.

    2005-01-01

    This work investigates the problematic of hot spots induced by accelerated particle fluxes in tokamaks. It is shown that the polarization due to sheaths in the edge plasma in which an electron beam at a high level of energy is injected, can reach several hundreds volts and thus extend the deposition area. The notion of obstructed sheath is introduced and explains the acceleration of energy deposition by the decreasing of the sheath potential. Then, a 2-dimensional fluid modeling of flux tubes in front of ICRF antennae allows us to calculate the rectified potentials taking into account RF polarization currents transverse to magnetic field lines. The 2-dimensional fluid code designed validates the analytical results which show that the DC rectified potential is 50% greater with polarization currents than without. Finally, the simultaneous application of an electron beam and a RF potential reveals that the potentials due to each phenomenon are additives when RF potential is much greater than beam polarization. The density depletion of polarized flux tubes in 2-dimensional PIC (particles in cells) simulations is characterized but not yet explained. (author)

  2. Nonlinear plasma experiments in geospace with gigawatts of RF power at HAARP

    Energy Technology Data Exchange (ETDEWEB)

    Sheerin, J. P., E-mail: jsheerin@emich.edu [Physics and Astronomy, Eastern Michigan Univ., Ypsilanti, MI 48197 (United States); Cohen, Morris B., E-mail: mcohen@gatech.edu [Electrical and Computer Engineering, Georgia Tech, Atlanta, GA 30332-0250 (United States)

    2015-12-10

    The ionosphere is the ionized uppermost layer of our atmosphere (from 70 – 500 km altitude) where free electron densities yield peak critical frequencies in the HF (3 – 30 MHz) range. The ionosphere thus provides a quiescent plasma target, stable on timescales of minutes, for a whole host of active plasma experiments. High power RF experiments on ionospheric plasma conducted in the U.S. have been reported since 1970. The largest HF transmitter built to date is the HAARP phased-array HF transmitter near Gakona, Alaska which can deliver up to 3.6 Gigawatts (ERP) of CW RF power in the range of 2.8 – 10 MHz to the ionosphere with microsecond pointing, power modulation, and frequency agility. With an ionospheric background thermal energy in the range of only 0.1 eV, this amount of power gives access to the highest regimes of the nonlinearity (RF intensity to thermal pressure) ratio. HAARP’s unique features have enabled the conduct of a number of unique nonlinear plasma experiments in the interaction region of overdense ionospheric plasma including generation of artificial aurorae, artificial ionization layers, VLF wave-particle interactions in the magnetosphere, parametric instabilities, stimulated electromagnetic emissions (SEE), strong Langmuir turbulence (SLT) and suprathermal electron acceleration. Diagnostics include the Modular UHF Ionospheric Radar (MUIR) sited at HAARP, the SuperDARN-Kodiak HF radar, spacecraft radio beacons, HF receivers to record stimulated electromagnetic emissions (SEE) and telescopes and cameras for optical emissions. We report on short timescale ponderomotive overshoot effects, artificial field-aligned irregularities (AFAI), the aspect angle dependence of the intensity of the HF-enhanced plasma line, and production of suprathermal electrons. One of the primary missions of HAARP, has been the generation of ELF (300 – 3000 Hz) and VLF (3 – 30 kHz) radio waves which are guided to global distances in the Earth

  3. Synthesis of Ni2B nanoparticles by RF thermal plasma for fuel cell catalyst

    International Nuclear Information System (INIS)

    Cheng, Y; Tanaka, M; Watanabe, T; Choi, S Y; Shin, M S; Lee, K H

    2014-01-01

    The catalyst of Ni 2 B nanoparticles was successfully prepared using nickel and boron as precursors with the quenching gas in radio frequency thermal plasmas. The generating of Ni 2 B needs adequate reaction temperature and boron content in precursors. The quenching gas is beneficial for the synthesis of Ni 2 B in RF thermal plasma. The effect of quenching rate, powder feed rate and boron content in feeding powders on the synthesis of nickel boride nanoparticles was studied in this research. The high mass fraction of 28 % of Ni 2 B nanoparticles can be generated at the fixed initial composition of Ni:B = 2:3. Quenching gas is necessary in the synthesis of Ni 2 B nanoaprticles. In addition, the mass fraction of Ni 2 B increases with the increase of quenching gas flow rate and powder feed rate

  4. Hybrid plasma system for magnetron deposition of coatings with ion assistance

    International Nuclear Information System (INIS)

    Vavilin, K V; Kralkina, E A; Nekludova, P A; Petrov, A. K; Nikonov, A M; Pavlov, V B; Airapetov, A A; Odinokov, V V; Pavlov, G Ya; Sologub, V A

    2016-01-01

    The results of the study of the plasma hybrid system based on the combined magnetron discharge and high-frequency inductive discharge located in the external magnetic field is presented. Magnetron discharge provides the generation of atoms and ions of the target materials while the flow of accelerated ions used for the ion assistance is provided by the RF inductive discharge. An external magnetic field is used to optimize the power input to the discharge, to increase the ion current density in the realm of substrate and to enhance the area of uniform plasma. The joint operation of magnetron and RF inductive discharge leads to a substantial increase (not equal to the sum of the parameters obtained under separate operation of two hybrid system channels) of the ion current density and intensity of sputtered material spectral lines radiation. Optimal mode of the hybrid plasma system operation provides uniform ion current density on the diameter of at least 150mm at 0.7PA argon pressure. The optimal values of the magnetic fields in the region of the substrate location lie in the range 2-8 mTl, while in the region of the RF input power unit lie in the range 0.5-25 mTl. (paper)

  5. Advancement of In-Flight Alumina Powder Spheroidization Process with Water Droplet Injection Using a Small Power DC-RF Hybrid Plasma Flow System

    Science.gov (United States)

    Jang, Juyong; Takana, Hidemasa; Park, Sangkyu; Nishiyama, Hideya

    2012-09-01

    The correlation between plasma thermofluid characteristics and alumina powder spheroidization processes with water droplet injection using a small power DC-RF hybrid plasma flow system was experimentally clarified. Micro-sized water droplets with a low water flow rate were injected into the tail of thermal plasma flow so as not to disturb the plasma flow directly. Injected water droplets were vaporized in the thermal plasma flow and were transported upstream in the plasma flow to the torch by the backflow. After dissociation of water, the production of hydrogen was detected by the optical emission spectroscopy in the downstream RF plasma flow. The emission area of the DC plasma jet expanded and elongated in the vicinity of the RF coils. Additionally, the emission area of RF plasma flow enlarged and was visible as red emission in the downstream RF plasma flow in the vicinity below the RF coils due to hydrogen production. Therefore, the plasma flow mixed with produced hydrogen increased the plasma enthalpy and the highest spheroidization rate of 97% was obtained at a water flow rate of 15 Sm l/min and an atomizing gas flow rate of 8 S l/min using a small power DC-RF hybrid plasma flow system.

  6. Iterative Addition of Kinetic Effects to Cold Plasma RF Wave Solvers

    Science.gov (United States)

    Green, David; Berry, Lee; RF-SciDAC Collaboration

    2017-10-01

    The hot nature of fusion plasmas requires a wave vector dependent conductivity tensor for accurate calculation of wave heating and current drive. Traditional methods for calculating the linear, kinetic full-wave plasma response rely on a spectral method such that the wave vector dependent conductivity fits naturally within the numerical method. These methods have seen much success for application to the well-confined core plasma of tokamaks. However, quantitative prediction of high power RF antenna designs for fusion applications has meant a requirement of resolving the geometric details of the antenna and other plasma facing surfaces for which the Fourier spectral method is ill-suited. An approach to enabling the addition of kinetic effects to the more versatile finite-difference and finite-element cold-plasma full-wave solvers was presented by where an operator-split iterative method was outlined. Here we expand on this approach, examine convergence and present a simplified kinetic current estimator for rapidly updating the right-hand side of the wave equation with kinetic corrections. This research used resources of the Oak Ridge Leadership Computing Facility at the Oak Ridge National Laboratory, which is supported by the Office of Science of the U.S. Department of Energy under Contract No. DE-AC05-00OR22725.

  7. RF plasma cleaning of silicon substrates with high-density polyethylene contamination

    Science.gov (United States)

    Cagomoc, Charisse Marie D.; De Leon, Mark Jeffry D.; Ebuen, Anna Sophia M.; Gilos, Marlo Nicole R.; Vasquez, Magdaleno R., Jr.

    2018-01-01

    Upon contact with a polymeric material, microparticles from the polymer may adhere to a silicon (Si) substrate during device processing. The adhesion contaminates the surface and, in turn, leads to defects in the fabricated Si-based microelectronic devices. In this study, Si substrates with artificially induced high-density polyethylene (HDPE) contamination was exposed to 13.56 MHz radio frequency (RF) plasma utilizing argon and oxygen gas admixtures at a power density of 5.6 W/cm2 and a working pressure of 110 Pa for up to 6 min of treatment. Optical microscopy studies revealed the removal of up to 74% of the polymer contamination upon plasma exposure. Surface free energy (SFE) increased owing to the removal of contaminants as well as the formation of polar groups on the Si surface after plasma treatment. Atomic force microscopy scans showed a decrease in surface roughness from 12.25 nm for contaminated samples to 0.77 nm after plasma cleaning. The smoothening effect can be attributed to the removal of HDPE particles from the surface. In addition, scanning electron microscope images showed that there was a decrease in the amount of HDPE contaminants adhering onto the surface after plasma exposure.

  8. Time-Domain Modeling of RF Antennas and Plasma-Surface Interactions

    Directory of Open Access Journals (Sweden)

    Jenkins Thomas G.

    2017-01-01

    Full Text Available Recent advances in finite-difference time-domain (FDTD modeling techniques allow plasma-surface interactions such as sheath formation and sputtering to be modeled concurrently with the physics of antenna near- and far-field behavior and ICRF power flow. Although typical sheath length scales (micrometers are much smaller than the wavelengths of fast (tens of cm and slow (millimeter waves excited by the antenna, sheath behavior near plasma-facing antenna components can be represented by a sub-grid kinetic sheath boundary condition, from which RF-rectified sheath potential variation over the surface is computed as a function of current flow and local plasma parameters near the wall. These local time-varying sheath potentials can then be used, in tandem with particle-in-cell (PIC models of the edge plasma, to study sputtering effects. Particle strike energies at the wall can be computed more accurately, consistent with their passage through the known potential of the sheath, such that correspondingly increased accuracy of sputtering yields and heat/particle fluxes to antenna surfaces is obtained. The new simulation capabilities enable time-domain modeling of plasma-surface interactions and ICRF physics in realistic experimental configurations at unprecedented spatial resolution. We will present results/animations from high-performance (10k-100k core FDTD/PIC simulations of Alcator C-Mod antenna operation.

  9. The characteristics of RF modulated plasma boundary sheaths: An analysis of the standard sheath model

    Science.gov (United States)

    Naggary, Schabnam; Brinkmann, Ralf Peter

    2015-09-01

    The characteristics of radio frequency (RF) modulated plasma boundary sheaths are studied on the basis of the so-called ``standard sheath model.'' This model assumes that the applied radio frequency ωRF is larger than the plasma frequency of the ions but smaller than that of the electrons. It comprises a phase-averaged ion model - consisting of an equation of continuity (with ionization neglected) and an equation of motion (with collisional ion-neutral interaction taken into account) - a phase-resolved electron model - consisting of an equation of continuity and the assumption of Boltzmann equilibrium -, and Poisson's equation for the electrical field. Previous investigations have studied the standard sheath model under additional approximations, most notably the assumption of a step-like electron front. This contribution presents an investigation and parameter study of the standard sheath model which avoids any further assumptions. The resulting density profiles and overall charge-voltage characteristics are compared with those of the step-model based theories. The authors gratefully acknowledge Efe Kemaneci for helpful comments and fruitful discussions.

  10. Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

    Czech Academy of Sciences Publication Activity Database

    Prysiazhnyi, V.; Slavíček, P.; Mikmeková, Eliška; Klíma, M.

    2016-01-01

    Roč. 18, č. 4 (2016), s. 430-437 ISSN 1009-0630 Institutional support: RVO:68081731 Keywords : atmospheric pressure plasma * plasma jet * aluminium * surface treatment * surface processing * chemical precleaning Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 0.830, year: 2016

  11. Preliminary results of a broad beam RF ion source with electron plasma interaction. Vol. 2

    Energy Technology Data Exchange (ETDEWEB)

    Abdelaziz, M E; Zakhary, S G; Ghanem, A A; Abdel-Ghaffar, A M [Ion Sources and Accelerators Department, Nuclear Research Center, Atomic Energy Authority, Cairo, (Egypt)

    1996-03-01

    A new design of a broad beam RF ion source is made to be capable to deliver wide and uniform beam with currents reaching (100 {mu} A up to 30 mA) at extraction voltages (200 V up to 2 kV). Its plasma intensifying system is made with the addition of electrons from an immersed filament in the discharge and axial magnetic field (70 up to 300 G). A uniform beam distribution is made with a planner graphite cathode which has a number of holes arranged to produce perveance matching with the normal Gaussian distribution of the beam density. These holes are arranged in a consequent orbits with equal distance between the adjacent holes in each orbit. These holes increase in diameter with increasing the orbit radius. This allows increasing the extracted ion currents at the source outer edges and decreases its value at the source inner region; producing wide and uniform beam which is suitable for material modifications. The beam profiles are traced with electromechanical scanner and X-Y recorder. The perveance matching is found to produce a beam uniformity of =66% of its width which reaches =6 cm. The variation of the output currents are with the variation of extraction voltages, magnetic field, discharge pressure and electron injection into the plasma. The extracted current increases with the increase of the discharge pressure, RF power and magnetic field intensity. The influence of electron plasma interaction is found to have a great effect on increasing the ion currents to about four times its value without electron interaction, however, this increase is limited due to presence of breakdown at V{sub ex} > 2 kV. The simple design of this source, its cleanness due to the use of pyrex discharge bottle, easy operation and maintenance adds other features to this broad beam type ion source which makes it suitable for metallurgical applications in broad beam accelerators. 6 figs.

  12. Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

    International Nuclear Information System (INIS)

    Prysiazhnyi, Vadym; Slavicek, Pavel; Klima, Milos; Mikmekova, Eliska

    2016-01-01

    This paper is aimed to show the influence of initial chemical pretreatment prior to subsequent plasma activation of aluminum surfaces. The results of our study showed that the state of the topmost surface layer (i.e. the surface morphology and chemical groups) of plasma modified aluminum significantly depends on the chemical precleaning. Commonly used chemicals (isopropanol, trichlorethane, solution of NaOH in deionized water) were used as precleaning agents. The plasma treatments were done using a radio frequency driven atmospheric pressure plasma pencil developed at Masaryk University, which operates in Ar, Ar/O 2 gas mixtures. The effectiveness of the plasma treatment was estimated by the wettability measurements, showing high wettability improvement already after 0.3 s treatment. The effects of surface cleaning (hydrocarbon removal), surface oxidation and activation (generation of OH groups) were estimated using infrared spectroscopy. The changes in the surface morphology were measured using scanning electron microscopy. Optical emission spectroscopy measurements in the near-to-surface region with temperature calculations showed that plasma itself depends on the sample precleaning procedure. (paper)

  13. Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

    Science.gov (United States)

    Vadym, Prysiazhnyi; Pavel, Slavicek; Eliska, Mikmekova; Milos, Klima

    2016-04-01

    This paper is aimed to show the influence of initial chemical pretreatment prior to subsequent plasma activation of aluminum surfaces. The results of our study showed that the state of the topmost surface layer (i.e. the surface morphology and chemical groups) of plasma modified aluminum significantly depends on the chemical precleaning. Commonly used chemicals (isopropanol, trichlorethane, solution of NaOH in deionized water) were used as precleaning agents. The plasma treatments were done using a radio frequency driven atmospheric pressure plasma pencil developed at Masaryk University, which operates in Ar, Ar/O2 gas mixtures. The effectiveness of the plasma treatment was estimated by the wettability measurements, showing high wettability improvement already after 0.3 s treatment. The effects of surface cleaning (hydrocarbon removal), surface oxidation and activation (generation of OH groups) were estimated using infrared spectroscopy. The changes in the surface morphology were measured using scanning electron microscopy. Optical emission spectroscopy measurements in the near-to-surface region with temperature calculations showed that plasma itself depends on the sample precleaning procedure.

  14. Theoretical modeling of the plasma-assisted catalytic growth and field emission properties of graphene sheet

    International Nuclear Information System (INIS)

    Sharma, Suresh C.; Gupta, Neha

    2015-01-01

    A theoretical modeling for the catalyst-assisted growth of graphene sheet in the presence of plasma has been investigated. It is observed that the plasma parameters can strongly affect the growth and field emission properties of graphene sheet. The model developed accounts for the charging rate of the graphene sheet; number density of electrons, ions, and neutral atoms; various elementary processes on the surface of the catalyst nanoparticle; surface diffusion and accretion of ions; and formation of carbon-clusters and large graphene islands. In our investigation, it is found that the thickness of the graphene sheet decreases with the plasma parameters, number density of hydrogen ions and RF power, and consequently, the field emission of electrons from the graphene sheet surface increases. The time evolution of the height of graphene sheet with ion density and sticking coefficient of carbon species has also been examined. Some of our theoretical results are in compliance with the experimental observations

  15. Investigation of parameters of the working substance - low temperature plasma in the ionization resonator chamber of the RF reactive engine

    International Nuclear Information System (INIS)

    Vdovin, V.S.; Zajtzev, B.V.; Kobetz, A.F.; Bomko, V.A.; Rashkovan, V.M.; Bazyma, L.A.; Belokon, V.I.

    2003-01-01

    This paper is the extension of investigations of the RF engine designed for orientation and stabilization of the spacecrafts orbit, and it is undertaken for measuring of plasma parameters of RF discharge in the ionization resonator chamber. The experiments were performed at the frequency of 80 MHz on the model engine, in which a length of coaxial line with shortening capacities at the ends was used as the ionization resonator chamber. As the result of the experiments, conditions of the RF discharge ignition in the resonator chamber are studied; dependencies of plasma density and temperature versus applied power and working body pressure are obtained for various gases. The measurements of the thrust were performed at the special-purpose test bench

  16. Structural, optical and electrical peculiarities of r.f. plasma sputtered indium tin oxide films

    International Nuclear Information System (INIS)

    Boycheva, Sylvia; Sytchkova, Anna Krasilnikova; Grilli, Maria Luisa; Piegari, Angela

    2007-01-01

    In this work the influence of the deposition conditions on the structural, electrical and optical properties of the ITO films was studied. Films were deposited by r.f. plasma sputtering technique in Ar and varying Ar + O 2 gas mixtures, with and without substrate heating. Transmittance and reflectance of the films were measured in the range 350-2500 nm; the refractive index (n) and the extinction coefficient (k) were calculated by the spectral data simulation. The sheet resistance of the films was measured by four-point probe method. X-ray diffraction analysis was performed to study the texture of the films. Threshold behaviour was observed in the optical and electrical properties of ITO films deposited in Ar + O 2 atmosphere at a certain oxygen concentration determined by a fix combination of all other deposition conditions. A schematic diagram for the change of the film properties versus composition was suggested, which explains the obtained results

  17. RF plasma-driven hydrogen permeation through a biased iron membrane

    International Nuclear Information System (INIS)

    Banno, T.; Waelbroeck, F.; Winter, J.

    1984-01-01

    The steady-state RF plasma-driven hydrogen permeation through an electrically biased iron membrane has been investigated as a function of the bias potential Vsub(M) for membrane temperatures in the range of 150-400 0 C. Vsub(M) has been gradually increased positively from the floating potential of the membrane. The permeation flux decreases when Vsub(M) increases at low voltages: positive hydrogen ions are repelled. The membrane temperature does not influence this effect measurably. The permeation flux starts to increase when Vsub(M) is raised higher, i.e. when energetic electrons strike the surface. This phenomenon shows a pronounced temperature dependence - the enhancement is largest for the lowest temperatures. The effect is interpreted in terms of an electron-induced dissociation of hydrogen molecules on the membrane surface. (orig.)

  18. Development of solid oxide fuel cells by applying DC and RF plasma deposition technologies

    Energy Technology Data Exchange (ETDEWEB)

    Schiller, G.; Henne, R.; Lang, M.; Mueller, M. [Deutsches Zentrum fuer Luft- und Raumfahrt (DLR), Institut fuer Technische Thermodynamik, Postfach 800370, 70503 Stuttgart (Germany)

    2004-04-01

    Based on advanced plasma deposition technology with both DC and RF plasmas DLR Stuttgart has developed a concept of a planar SOFC with consecutive deposition of all layers of a thin-film cell onto a porous metallic substrate support. This concept is an alternative approach to conventionally used sintering techniques for SOFC fabrication without needing any sintering steps or other thermal post-treatment. Furthermore, is has the potential to be developed into an automated continous production process. For both stationary and mobile applications, adequate stack designs and stack technologies have been developed. Future development work will focus on light-weight stacks to be applied as an Auxillary Power Unit (APU) for on-board electricity supply in passenger cars and airplanes. This paper describes the plasma deposition technologies used for cell fabrication and the DLR spray concept including the resulting stack designs. The current status of development and recent progress with respect to materials development and electrochemical characterization of single cells and short-stacks is presented. (Abstract Copyright [2004], Wiley Periodicals, Inc.)

  19. Hydrogen retention in carbon-tungsten co-deposition layer formed by hydrogen RF plasma

    International Nuclear Information System (INIS)

    Katayama, K.; Kawasaki, T.; Manabe, Y.; Nagase, H.; Takeishi, T.; Nishikawa, M.

    2006-01-01

    Carbon-tungsten co-deposition layers (C-W layers) were formed by sputtering method using hydrogen or deuterium RF plasma. The deposition rate of the C-W layer by deuterium plasma was faster than that by hydrogen plasma, where the increase of deposition rate of tungsten was larger than that of carbon. This indicates that the isotope effect on sputtering-depositing process for tungsten is larger than that for carbon. The release curve of hydrogen from the C-W layer showed two peaks at 400 deg. C and 700 deg. C. Comparing the hydrogen release from the carbon deposition layer and the tungsten deposition layer, it is considered that the increase of the release rate at 400 deg. C is affected by tungsten and that at 700 deg. C is affected by carbon. The obtained hydrogen retention in the C-W layers which have over 60 at.% of carbon was in the range between 0.45 and 0.16 as H/(C + W)

  20. Plasma Turbulence Suppression and Transport Barrier Formation by Externally Driven RF Waves in Spherical Tokamaks

    International Nuclear Information System (INIS)

    Bruma, C.; Cuperman, S.C.; Komoshvili, K.

    2002-01-01

    Turbulent transport of heat and particles is the principle obstacle confronting controlled fusion today. Thus, we investigate quantitatively the suppression of turbulence and formation of transport barriers in spherical tokamaks by sheared electric fields generated by externally driven radio-frequency (RF) waves, in the frequency range o)A n o] < o)ci (e)A and o)ci are the Alfven and ion cyclotron frequencies). This investigation consists of the solution of the full-wave equation for a spherical tokamak in the presence of externally driven fast waves and the evaluation of the power dissipation by the mode-converted Alfven waves. This in turn, provides a radial flow shear responsible for the suppression of plasma turbulence. Thus, a strongly non-linear equation for the radial sheared electric field is solved, the turbulent transport suppression rate is evaluated and compared with the ion temperature gradient (ITG) instability increment. For illustration, the case of START-like device (Sykes 2000) is treated. Thus, (i) the exact D-shape cross-section is considered; (ii) additional kinetic (including Landau damping) and particle trapping effects are added to the resistive two-fluid dielectric tensor operator; (iii) a finite extension antenna located on the low-field-side of the plasma is considered; (iv) a rigorous 2.5 finite elements numerical code (Sewell 1993) is used; and (v) the turbulence and transport barrier generated as a result of wave-plasma interaction is evaluated

  1. A High-Intensity, RF Plasma-Sputter Negative Ion Source

    International Nuclear Information System (INIS)

    Alton, G.D.; Bao, Y.; Cui, B.; Lohwasser, R.; Reed, C.A.; Zhang, T.

    1999-01-01

    A high-intensity, plasma-sputter negative-ion source based on the use of RF power for plasma generation has been developed that can be operated in either pulsed or dc modes. The source utilizes a high-Q, self-igniting, inductively coupled antenna system, operating at 80 MHz that has been optimized to generate Cs-seeded plasmas at low pressures (typically, - (610 microA); F - (100 microA); Si - (500 microA); S - (500 microA); P - (125 microA); Cl - (200 microA); Ni - (150 microA); Cu - (230 microA); Ge - (125 microA); As - (100 microA); Se - (200 microA); Ag - (70 microA); Pt - (125 microA); Au - (250 microA). The normalized emittance var e psilon n of the source at the 80% contour is: var e psilon n = 7.5 mm.mrad.(MeV) 1/2 . The design principles of the source, operational parameters, ion optics, emittance and intensities for a number of negative-ion species will be presented in this report

  2. A versatile ray-tracing code for studying rf wave propagation in toroidal magnetized plasmas

    International Nuclear Information System (INIS)

    Peysson, Y; Decker, J; Morini, L

    2012-01-01

    A new ray-tracing code named C3PO has been developed to study the propagation of arbitrary electromagnetic radio-frequency (rf) waves in magnetized toroidal plasmas. Its structure is designed for maximum flexibility regarding the choice of coordinate system and dielectric model. The versatility of this code makes it particularly suitable for integrated modeling systems. Using a coordinate system that reflects the nested structure of magnetic flux surfaces in tokamaks, fast and accurate calculations inside the plasma separatrix can be performed using analytical derivatives of a spline-Fourier interpolation of the axisymmetric toroidal MHD equilibrium. Applications to reverse field pinch magnetic configuration are also included. The effects of 3D perturbations of the axisymmetric toroidal MHD equilibrium, due to the discreteness of the magnetic coil system or plasma fluctuations in an original quasi-optical approach, are also studied. Using a Runge–Kutta–Fehlberg method for solving the set of ordinary differential equations, the ray-tracing code is extensively benchmarked against analytical models and other codes for lower hybrid and electron cyclotron waves. (paper)

  3. Ion-induced crystal damage during plasma-assisted MBE growth of GaN layers

    Science.gov (United States)

    Kirchner, V.; Heinke, H.; Birkle, U.; Einfeldt, S.; Hommel, D.; Selke, H.; Ryder, P. L.

    1998-12-01

    Gallium nitride layers were grown by plasma-assisted molecular-beam epitaxy on (0001)-oriented sapphire substrates using an electron cyclotron resonance (ECR) and a radio frequency (rf) plasma source. An applied substrate bias was varied from -200 to +250 V, resulting in a change of the density and energy of nitrogen ions impinging the growth surface. The layers were investigated by high-resolution x-ray diffractometry and high-resolution transmission electron microscopy (HRTEM). Applying a negative bias during growth has a marked detrimental effect on the crystal perfection of the layers grown with an ECR plasma source. This is indicated by a change in shape and width of (0002) and (202¯5) reciprocal lattice points as monitored by triple axis x-ray measurements. In HRTEM images, isolated basal plane stacking faults were found, which probably result from precipitation of interstitial atoms. The crystal damage in layers grown with a highly negative substrate bias is comparable to that observed for ion implantation processes at orders of magnitude larger ion energies. This is attributed to the impact of ions on the growing surface. None of the described phenomena was observed for the samples grown with the rf plasma source.

  4. Design of an RF Antenna for a Large-Bore, High Power, Steady State Plasma Processing Chamber for Material Separation

    International Nuclear Information System (INIS)

    Rasmussen, D.A.; Freeman, R.L.

    2001-01-01

    The purpose of this Cooperative Research and Development Agreement (CRADA) between UT-Battelle, LLC, (Contractor), and Archimedes Technology Group, (Participant) is to evaluate the design of an RF antenna for a large-bore, high power, steady state plasma processing chamber for material separation. Criteria for optimization will be to maximize the power deposition in the plasma while operating at acceptable voltages and currents in the antenna structure. The project objectives are to evaluate the design of an RF antenna for a large-bore, high power, steady state plasma processing chamber for material separation. Criteria for optimization will be to maximize the power deposition in the plasma while operating at acceptable voltages and currents in the antenna structure

  5. Plasma enhanced RF power deposition on ICRF antennas in Tore Supra

    International Nuclear Information System (INIS)

    Goulding, R.H.; Harris, J.H.; Carter, M.D.; Hoffman, D.J.; Hogan, J.T.; Ryan, P.M.; Beaumont, B.; Bremond, S.; Hutter, T.

    1997-01-01

    The dual-strap Tore Supra ICRF antennas have been very successful in coupling high power fluxes > 16 MW/m2 to the plasma. In many cases it has been found that the power is limited not by the voltages and currents that can be sustained on antenna components, but rather by localized increases in antenna surface temperatures which are correlated with increased impurity levels. Hot spots have been observed using an IR imaging system with peak temperatures as high as 1,100 C after 2 s, and as little as 1.5 MW power coupled from a single launcher. The maximum temperature observed is highly dependent on antenna phasing, and is lowest with dipole (π) phasing of the relative antenna currents. Both toroidal and poloidal asymmetries in hot spot distribution have been observed, and interestingly, the toroidal asymmetry has been found to vary when the phase is changed from +π/2 to -π/2. Significant differences in the temperature profiles have been seen on the two types of Faraday shield in use, which appears to be related to the fact that one type has a recessed center septum between straps while the other does not. In some cases, the peak temperature has been observed to increase as the antenna/plasma gap is increased, while the peak remains in the same location. This behavior suggests that voltages generated by currents flowing in the Faraday shield structure itself may play a role in generating potentials responsible for the hot spots, in addition to rf fields in the plasma. In this paper data on antenna surface heating and loading data as a function of plasma density, antenna/plasma gap, and phasing will be presented. Calculations from the RANT3D electromagnetic code together with bench measurements of electric fields near the antenna surface will also be shown

  6. How to increase the hydrophobicity of PTFE surfaces using an r.f. atmospheric-pressure plasma torch

    NARCIS (Netherlands)

    Carbone, E.A.D.; Boucher, N.; Sferrazza, M.; Reniers, F.

    2010-01-01

    An experimental investigation of the surface modification of polytetrafluoroethylene (PTFE) by an Ar and Ar/O2 plasma created with an atmospheric-pressure radio frequency (r.f.) torch is presented here. The surfaces were analyzed by atomic force microscopy (AFM), XPS and water contact angle (WCA) to

  7. Progress towards RF heated steady-state plasma operations on LHD by employing ICRF heating methods and improved divertor plates

    International Nuclear Information System (INIS)

    Kumazawa, R.; Mutoh, T.; Saito, K.

    2008-10-01

    A long pulse plasma discharge experiment was carried out using RF heating power in the Large Helical Device (LHD), a currentless magnetic confining system. Progress in long pulse operation is summarized since the 10th experimental campaign (2006). A scaling relation of the plasma duration time to the applied RF power has been derived from the experimental data so far collected. It indicates that there exists a critical divertor temperature and consequently a critical RF heating power P RFcrit =0.65 MW. The area on the graph of the duration time versus the RF heating power was extended over the scaling relation by replacing divertor plates with new ones with better heat conductivity. The cause of the plasma collapse at the end of the long pulse operation was found to be the penetration of metal impurities. Many thin flakes consisting of heavy metals and graphite in stratified layers were found on the divertor plates and it was thought that they were the cause of impurity metals penetrating into the plasma. In a simulation involving injecting a graphite-coated Fe pellet to the plasma it was found that 230 Eμm in the diameter of the Fe pellet sphere was the critical size which led the plasma to collapse. A mode-conversion heating method was examined in place of the minority ICRF heating which has been employed in almost all the long-pulse plasma discharges. It was found that this method was much better from the viewpoint of achieving uniformity of the plasma heat load to the divertors. It is expected that P RFcrit will be increased by using the mode-conversion heating method. (author)

  8. A novel cupping-assisted plasma treatment for skin disinfection

    Science.gov (United States)

    Xiong, Zilan; Graves, David B.

    2017-02-01

    A novel plasma treatment method/plasma source called cupping-assisted plasma treatment/source for skin disinfection is introduced. The idea combines ancient Chinese ‘cupping’ technology with plasma sources to generate active plasma inside an isolated, pressure-controlled chamber attached to the skin. Advantages of lower pressure include reducing the threshold voltage for plasma ignition and improving the spatial uniformity of the plasma treatment. In addition, with reduced pressure inside the cup, skin pore permeability might be increased and it improves attachment of the plasma device to the skin. Moreover, at a given pressure, plasma-generated active species are restricted inside the cup, raising local reactive species concentration and enhancing the measured surface disinfection rate. A surface micro-discharge (SMD) device is used as an example of a working plasma source. We report discharge characteristics and disinfection efficiency as a function of pressure and applied voltage.

  9. RF power absorption by plasma of low pressure low power inductive discharge located in the external magnetic field

    Science.gov (United States)

    Kralkina, E. A.; Rukhadze, A. A.; Nekliudova, P. A.; Pavlov, V. B.; Petrov, A. K.; Vavilin, K. V.

    2018-03-01

    Present paper is aimed to reveal experimentally and theoretically the influence of magnetic field strength, antenna shape, pressure, operating frequency and geometrical size of plasma sources on the ability of plasma to absorb the RF power characterized by the equivalent plasma resistance for the case of low pressure RF inductive discharge located in the external magnetic field. The distinguishing feature of the present paper is the consideration of the antennas that generate not only current but charge on the external surface of plasma sources. It is shown that in the limited plasma source two linked waves can be excited. In case of antennas generating only azimuthal current the waves can be attributed as helicon and TG waves. In the case of an antenna with the longitudinal current there is a surface charge on the side surface of the plasma source, which gives rise to a significant increase of the longitudinal and radial components of the RF electric field as compared with the case of the azimuthal antenna current.

  10. Digitally-assisted analog and RF CMOS circuit design for software-defined radio

    CERN Document Server

    Okada, Kenichi

    2011-01-01

    This book describes the state-of-the-art in RF, analog, and mixed-signal circuit design for Software Defined Radio (SDR). It synthesizes for analog/RF circuit designers the most important general design approaches to take advantage of the most recent CMOS technology, which can integrate millions of transistors, as well as several real examples from the most recent research results.

  11. RF Sheath-Enhanced Plasma Surface Interaction Studies using Beryllium Optical Emission Spectroscopy in JET ITER-Like Wall

    Energy Technology Data Exchange (ETDEWEB)

    Agarici, G. [Fusion for Energy (F4E), Barcelona, Spain; Klepper, C Christopher [ORNL; Colas, L. [French Atomic Energy Commission (CEA); Krivska, Alena [Ecole Royale Militaire, Brussels Belgium; Bobkov, V. [Max-Planck-Institut fur Plasmaphysik, EURATOM Association, Garching, Germany; Jacquet, P. [Culham Centre for Fusion Energy (CCFE), Abingdon, UK; Delabie, Ephrem G. [ORNL; Giroud, C. [EURATOM / UKAEA, UK; Kirov, K K. [Association EURATOM-CCFE, Abingdon, UK; Lasa Esquisabel, Ane [ORNL; Lerche, E. [ERM-KMS, Association EURATOM-Belgian State, Brussels, Belgium; Dumortier, P. [ERM-KMS, Association EURATOM-Belgian State, Brussels, Belgium; Durodie, Frederic [Ecole Royale Militaire, Brussels Belgium

    2017-10-01

    A dedicated study on JET-ILW, deploying two types of ICRH antennas and spectroscopic observation spots at two outboard, beryllium limiters, has provided insight on long-range (up to 6m) RFenhanced plasma-surface interactions (RF-PSI) due to near-antenna electric fields. To aid in the interpretation of optical emission measurements of these effects, the antenna near-fields are computed using the TOPICA code, specifically run for the ITER-like antenna (ILA); similar modelling already existed for the standard JET antennas (A2). In the experiment, both antennas were operated in current drive mode, as RF-PSI tends to be higher in this phasing and at similar power (∼0.5 MW). When sweeping the edge magnetic field pitch angle, peaked RF-PSI effects, in the form of 2-4 fold increase in the local Be source,are consistently measured with the observation spots magnetically connect to regions of TOPICAL-calculated high near-fields, particularly at the near-antenna limiters. It is also found that similar RF-PSI effects are produced by the two types of antenna on similarly distant limiters. Although this mapping of calculated near-fields to enhanced RF-PSI gives only qualitative interpretion of the data, the present dataset is expected to provide a sound experimental basis for emerging RF sheath simulation model validation.

  12. Etching of UO2 in NF3 RF Plasma Glow Discharge

    International Nuclear Information System (INIS)

    John M. Veilleux

    1999-01-01

    A series of room temperature, low pressure (10.8 to 40 Pa), low power (25 to 210 W) RF plasma glow discharge experiments with UO 2 were conducted to demonstrate that plasma treatment is a viable method for decontaminating UO 2 from stainless steel substrates. Experiments were conducted using NF 3 gas to decontaminate depleted uranium dioxide from stainless-steel substrates. Depleted UO 2 samples each containing 129.4 Bq were prepared from 100 microliter solutions of uranyl nitrate hexahydrate solution. The amorphous UO 2 in the samples had a relatively low density of 4.8 gm/cm 3 . Counting of the depleted UO 2 on the substrate following plasma immersion was performed using liquid scintillation counting with alpha/beta discrimination due to the presence of confounding beta emitting daughter products, 234 Th and 234 Pa. The alpha emission peak from each sample was integrated using a gaussian and first order polynomial fit to improve quantification. The uncertainties in the experimental measurement of the etched material were estimated at about ± 2%. Results demonstrated that UO 2 can be completely removed from stainless-steel substrates after several minutes processing at under 200 W. At 180 W and 32.7 Pa gas pressure, over 99% of all UO 2 in the samples was removed in just 17 minutes. The initial etch rate in the experiments ranged from 0.2 to 7.4 microm/min. Etching increased with the plasma absorbed power and feed gas pressure in the range of 10.8 to 40 Pa. A different pressure effect on UO 2 etching was also noted below 50 W in which etching increased up to a maximum pressure, approximately23 Pa, then decreased with further increases in pressure

  13. Role of metastable atoms in argon-diluted silane Rf plasmas

    International Nuclear Information System (INIS)

    Sansonnens, L.; Howling, A.A.; Hollenstein, C.; Dorier, J.L.; Kroll, U.

    1994-01-01

    The evolution of the argon metastable density has been studied by absorption spectroscopy in power-modulated plasmas of argon and a mixture of 4% silane in argon. A small concentration of silane suppresses the argon metastable density by molecular quenching. This molecular quenching adds to the electronic collisional dissociation to increase the silane dissociation rate as compared with pure silane plasmas. Using time-resolved emission spectroscopy, the role of metastables in excitation to the argon 2P 2 state has been determined in comparison with production from the ground state. In silane plasmas, emission from SiH* is due essentially to electron impact dissociation of silane, whereas in 4% silane-in-argon plasmas, emission from SiH* seems to be due to electron impact excitation of the SiH ground state. These studies demonstrate that argon is not simply a buffer gas but has an influence on the dissociation rate in the plasma-assisted deposition of amorphous silicon using argon-diluted silane plasmas. (author) 7 figs., 30 refs

  14. A study on etching of UO2, Co, and Mo surface with R.F. plasma using CF4 and O2

    International Nuclear Information System (INIS)

    Kim, Yong Soo; Seo, Yong Dae

    2003-01-01

    Recently dry decontamination/surface-cleaning technology using plasma etching has been focused in the nuclear industry. In this study, the applicability of this new dry processing technique are experimentally investigated by examining the etching reaction of UO 2 , Co, and Mo in r.f. plasma with the etchant gas of CF 4 /O 2 mixture. UO 2 is chosen as a representing material for uranium and TRU (TRans-Uranic) compounds while metallic Co and Mo are selected because they are the principal contaminants in the used metallic nuclear components such as valves and pipes made of stainless steel or Inconel. Results show that in all cases maximum etching rate is achieved when the mole fraction of O 2 in CF 4 /O 2 mixture gas is 20%, regardless of temperature and r.f. power. In case of UO 2 , the highest etching reaction rate is greater than 1000 monolayers/min. at 370 .deg. C under 150 W r.f. power which is equivalent to 0.4 μm/min. As for Co, etching reaction begins to take place significantly when the temperature exceeds 350 .deg. C. Maximum etching rate achieved at 380 .deg. C is 0.06 μm/min. Mo etching reaction takes place vigorously even at relatively low temperature and the reaction rate increases drastically with increasing temperature. Highest etching rate at 380 .deg. C is 1.9 μm /min. According to OES (Optical Emission Spectroscopy) and AES (Auger Electron Spectroscopy) analysis, primary reaction seems to be a fluorination reaction, but carbonyl compound formation reaction may assist the dominant reaction, especially in case of Co and Mo. Through this basic study, the feasibility and the applicability of plasma decontamination technique are demonstrated

  15. Spatio-temporal evolution of the dust particle size distribution in dusty argon rf plasmas

    International Nuclear Information System (INIS)

    Killer, Carsten; Mulsow, Matthias; Melzer, André

    2015-01-01

    An imaging Mie scattering technique has been developed to measure the spatially resolved size distribution of dust particles in extended dust clouds. For large dust clouds of micrometre-sized plastic particles confined in an radio frequency (rf) discharge, a segmentation of the dust cloud into populations of different sizes is observed, even though the size differences are very small. The dust size dispersion inside a population is much smaller than the difference between the populations. Furthermore, the dust size is found to be constantly decreasing over time while the particles are confined in an inert argon plasma. The processes responsible for the shrinking of the dust in the plasma have been addressed by mass spectrometry, ex situ microscopy of the dust size, dust resonance measurements, in situ determination of the dust surface temperature and Fourier transform infrared absorption (FT-IR). It is concluded that both a reduction of dust size and its mass density due to outgassing of water and other volatile constituents as well as chemical etching by oxygen impurities are responsible for the observations. (paper)

  16. Thin TiO2 films deposited by implantation and sputtering in RF inductively coupled plasmas

    International Nuclear Information System (INIS)

    Valencia-Alvarado, R; López-Callejas, R; Barocio, S R; Mercado-Cabrera, A; Peña-Eguiluz, R; Muñoz-Castro, A E; Rodríguez-Méndez, B G; De la Piedad-Beneitez, A; De la Rosa-Vázquez, J M

    2012-01-01

    The achievement of titanium dioxide (TiO 2 ) thin films in the rutile crystalline phase is reported. The samples result from the implantation of oxygen ions of Ti in argon/oxygen plasma generated by inductively coupled RF at a commercial 13.56 MHz frequency. Simultaneously, a sputtering process is conducted on the titanium target in order to produce TiO 2 thin films in the anatase phase over silicon and glass substrates. Both implantation and sputtering processes shared the same 500 W plasma with the target, polarized between 0 and -3 kV. The substrates were placed between 2 and 3 cm from the target, this distance being found to be determinant of the TiO 2 deposition rate. The rutile phase in the target was obtained at temperatures in the order of 680 degrees C and the anatase (unbiased) one at about 300 degrees C without any auxiliary heating. The crystalline phases were characterized by x ray diffraction and Raman spectroscopy. The morphology and average roughness were established by means of scanning electronic and atomic force microscopy, whereas the reaction products generated during the oxidation process were analyzed by mass spectrometry. Finally, the stoichiometric composition was measured by means of X-ray photoelectron spectroscopy.

  17. Modification of the surface properties of glass-ceramic materials at low-pressure RF plasma stream

    Science.gov (United States)

    Tovstopyat, Alexander; Gafarov, Ildar; Galeev, Vadim; Azarova, Valentina; Golyaeva, Anastasia

    2018-05-01

    The surface roughness has a huge effect on the mechanical, optical, and electronic properties of materials. In modern optical systems, the specifications for the surface accuracy and smoothness of substrates are becoming even more stringent. Commercially available pre-polished glass-ceramic substrates were treated with the radio frequency (RF) inductively coupled (13.56 MHz) low-pressure plasma to clean the surface of the samples and decrease the roughness. Optical emission spectroscopy was used to investigate the plasma stream parameters and phase-shifted interferometry to investigate the surface of the specimen. In this work, the dependence of RF inductively coupled plasma on macroscopic parameters was investigated with the focus on improving the surfaces. The ion energy, sputtering rate, and homogeneity were investigated. The improvements of the glass-ceramic surfaces from 2.6 to 2.2 Å root mean square by removing the "waste" after the previous operations had been achieved.

  18. Application of epifluorescence scanning for monitoring the efficacy of protein removal by RF gas-plasma decontamination

    Energy Technology Data Exchange (ETDEWEB)

    Baxter, Helen C; Richardson, Patricia R; Campbell, Gaynor A; Jones, Anita C; Baxter, Robert L [School of Chemistry, Joseph Black Chemistry Building, University of Edinburgh, West Mains Road, Edinburgh EH9 3JJ (United Kingdom); Kovalev, Valeri I; Maier, Robert; Barton, James S [School of Engineering and Physical Science, Heriot-Watt University, Edinburgh EH14 4AS (United Kingdom); DeLarge, Greg [Plasma Etch Inc, 3522 Arrowhead Drive, Carson City, NV 89706 (United States); Casey, Mark [Sterile Services Department, Royal Infirmary of Edinburgh, Edinburgh EH16 4AS (United Kingdom)], E-mail: r.baxter@ed.ac.uk

    2009-11-15

    The development of methods for measuring the efficiency of gas-plasma decontamination has lagged far behind application. An approach to measuring the efficiency of protein removal from solid surfaces using fluorescein-labelled bovine serum albumin and epifluorescence scanning (EFSCAN) is described. A method for fluorescently labelling proteins, which are adsorbed and denatured on metal surfaces, has been developed. Both approaches have been used to evaluate the efficiency of radio frequency (RF) gas-plasma decontamination protocols. Examples with 'real' surgical instruments demonstrate that an argon-oxygen RF gas-plasma treatment can routinely reduce the protein load by about three orders of magnitude beyond that achieved by current decontamination methods.

  19. Model polymer etching and surface modification by a time modulated RF plasma jet: role of atomic oxygen and water vapor

    International Nuclear Information System (INIS)

    Luan, P; Knoll, A J; Wang, H; Oehrlein, G S; Kondeti, V S S K; Bruggeman, P J

    2017-01-01

    The surface interaction of a well-characterized time modulated radio frequency (RF) plasma jet with polystyrene, poly(methyl methacrylate) and poly(vinyl alcohol) as model polymers is investigated. The RF plasma jet shows fast polymer etching but mild chemical modification with a characteristic carbonate ester and NO formation on the etched surface. By varying the plasma treatment conditions including feed gas composition, environment gaseous composition, and treatment distance, we find that short lived species, especially atomic O for Ar/1% O 2 and 1% air plasma and OH for Ar/1% H 2 O plasma, play an essential role for polymer etching. For O 2 containing plasma, we find that atomic O initiates polymer etching and the etching depth mirrors the measured decay of O atoms in the gas phase as the nozzle-surface distance increases. The etching reaction probability of an O atom ranging from 10 −4 to 10 −3 is consistent with low pressure plasma research. We also find that adding O 2 and H 2 O simultaneously into Ar feed gas quenches polymer etching compared to adding them separately which suggests the reduction of O and OH density in Ar/O 2 /H 2 O plasma. (letter)

  20. Model polymer etching and surface modification by a time modulated RF plasma jet: role of atomic oxygen and water vapor

    Science.gov (United States)

    Luan, P.; Knoll, A. J.; Wang, H.; Kondeti, V. S. S. K.; Bruggeman, P. J.; Oehrlein, G. S.

    2017-01-01

    The surface interaction of a well-characterized time modulated radio frequency (RF) plasma jet with polystyrene, poly(methyl methacrylate) and poly(vinyl alcohol) as model polymers is investigated. The RF plasma jet shows fast polymer etching but mild chemical modification with a characteristic carbonate ester and NO formation on the etched surface. By varying the plasma treatment conditions including feed gas composition, environment gaseous composition, and treatment distance, we find that short lived species, especially atomic O for Ar/1% O2 and 1% air plasma and OH for Ar/1% H2O plasma, play an essential role for polymer etching. For O2 containing plasma, we find that atomic O initiates polymer etching and the etching depth mirrors the measured decay of O atoms in the gas phase as the nozzle-surface distance increases. The etching reaction probability of an O atom ranging from 10-4 to 10-3 is consistent with low pressure plasma research. We also find that adding O2 and H2O simultaneously into Ar feed gas quenches polymer etching compared to adding them separately which suggests the reduction of O and OH density in Ar/O2/H2O plasma.

  1. Gas and plasma dynamics of RF discharge jet of low pressure in a vacuum chamber with flat electrodes and inside tube, influence of RF discharge on the steel surface parameters

    Science.gov (United States)

    Khristoliubova, V. I.; Kashapov, N. F.; Shaekhov, M. F.

    2016-06-01

    Researches results of the characteristics of the RF discharge jet of low pressure and the discharge influence on the surface modification of high speed and structural steels are introduced in the article. Gas dynamics, power and energy parameters of the RF low pressure discharge flow in the discharge chamber and the electrode gap are studied in the presence of the materials. Plasma flow rate, discharge power, the concentration of electrons, the density of RF power, the ion current density, and the energy of the ions bombarding the surface materials are considered for the definition of basic properties crucial for the process of surface modification of materials as they were put in the plasma jet. The influence of the workpiece and effect of products complex configuration on the RF discharge jet of low pressure is defined. The correlation of the input parameters of the plasma unit on the characteristics of the discharge is established.

  2. Look at energy compression as an assist for high power rf production

    International Nuclear Information System (INIS)

    Birx, D.L.; Farkas, Z.D.; Wilson, P.B.

    1984-01-01

    The desire to construct electron linacs of higher and higher energies, coupled with the realities of available funding and real estate, has forced machine designers to reassess the limitations in both accelerator gradient (MeV/m) and energy. The gradients achieved in current radio-frequency (RF) linacs are sometimes set by electrical breakdown in the accelerating structure, but are in most cases determined by the RF power level available to drive the linac. In this paper we will not discuss RF power sources in general, but rather take a brief look at several energy compression schemes which might be of service in helping to make better use of the sources we employ. We will, however, diverge for a bit and discuss what the RF power requirements are. 12 references, 21 figures, 3 tables

  3. DBD plasma assisted combustion for 1D flat flame

    NARCIS (Netherlands)

    Elkholy, A.H.E.

    2015-01-01

    The potential use of non-equilibrium plasma for ignition and combustion control has garnered increasing interest due to the possibility of plasma-assisted approaches for ignition and flame stabilization. During the past decade, significant progress has been made toward understanding the mechanisms

  4. Plasma-assisted cleaning of extreme UV optics

    NARCIS (Netherlands)

    Dolgov, Alexandr Alexeevich

    2018-01-01

    Plasma-assisted cleaning of extreme UV optics EUV-induced surface plasma chemistry of photo-active agents The next generation of photolithography, extreme ultraviolet (EUV) lithography, makes use of 13.5 nm radiation. The ionizing photon flux, and vacuum requirements create a challenging operating

  5. Filtering peripheral high temperature electrons in a cylindrical rf-driven plasmas by an axisymmetric radial magnetic field

    Directory of Open Access Journals (Sweden)

    Hikaru Akahoshi

    2018-03-01

    Full Text Available High temperature electrons generated near a radial wall of a cylindrical source tube in a radiofrequency (rf inductively-coupled plasma is filtered by an axisymmetric radial magnetic field formed near the source exit by locating annular permanent magnets, where the axial magnetic field strength in the radially central region is fairly uniform inside the source tube and is close to zero near the source exit. The source is operated at 3 mTorr in argon and the rf antenna is powered by a 13.56 MHz and 400 W rf generator. Measurement of electron energy probability functions shows the presence of the peripheral high temperature electrons inside the source, while the temperature of the peripheral electrons downstream of the source is observed to be reduced.

  6. Filtering peripheral high temperature electrons in a cylindrical rf-driven plasmas by an axisymmetric radial magnetic field

    Science.gov (United States)

    Akahoshi, Hikaru; Takahashi, Kazunori; Ando, Akira

    2018-03-01

    High temperature electrons generated near a radial wall of a cylindrical source tube in a radiofrequency (rf) inductively-coupled plasma is filtered by an axisymmetric radial magnetic field formed near the source exit by locating annular permanent magnets, where the axial magnetic field strength in the radially central region is fairly uniform inside the source tube and is close to zero near the source exit. The source is operated at 3 mTorr in argon and the rf antenna is powered by a 13.56 MHz and 400 W rf generator. Measurement of electron energy probability functions shows the presence of the peripheral high temperature electrons inside the source, while the temperature of the peripheral electrons downstream of the source is observed to be reduced.

  7. Development of localized arc filament RF plasma actuators for high-speed and high Reynolds number flow control

    International Nuclear Information System (INIS)

    Kim, J.-H.; Nishihara, M.; Adamovich, I.V.; Samimy, M.; Gorbatov, S.V.; Pliavaka, F.V.

    2010-01-01

    Recently developed localized arc filament plasma actuators (LAFPAs) have shown tremendous control authority in high-speed and high Reynolds number flow for mixing enhancement and noise mitigation. Previously, these actuators were powered by a high-voltage pulsed DC plasma generator with low energy coupling efficiency of 5-10%. In the present work, a new custom-designed 8-channel pulsed radio frequency (RF) plasma generator has been developed to power up to 8 plasma actuators operated over a wide range of forcing frequencies (up to 50 kHz) and duty cycles (1-50%), and at high energy coupling efficiency (up to 80-85%). This reduces input electrical power requirements by approximately an order of magnitude, down to 12 W per actuator operating at 10% duty cycle. The new pulsed RF plasma generator is scalable to a system with a large number of channels. Performance of pulsed RF plasma actuators used for flow control was studied in a Mach 0.9 circular jet with a Reynolds number of about 623,000 and compared with that of pulsed DC actuators. Eight actuators were distributed uniformly on the perimeter of a 2.54-cm diameter circular nozzle extension. Both types of actuators coupled approximately the same amount of power to the flow, but with drastically different electrical inputs to the power supplies. Particle image velocimetry measurements showed that jet centerline Mach number decay produced by DC and RF actuators operating at the same forcing frequencies and duty cycles is very similar. At a forcing Strouhal number near 0.3, close to the jet column instability frequency, well-organized periodic structures, with similar patterns and dimensions, were generated in the jets forced by both DC and RF actuators. Far-field acoustic measurements demonstrated similar trends in the overall sound pressure level (OASPL) change produced by both types of actuators, resulting in OASPL reduction up to 1.2-1.5 dB in both cases. We conclude that pulsed RF actuators demonstrate flow

  8. First results on nitriding aluminium alloys in a low-pressure RF plasma

    International Nuclear Information System (INIS)

    Fewell, M.P.; Priest, J.M.; Collins, G.A.; Short, K.T.

    2000-01-01

    Full text: Aluminium alloys are now well established as materials of choice for many commercial applications, especially where strength-to-weight ratio is a critical parameter. However, their more widespread use is inhibited by their low surface hardness. For steels, similar problems can be overcome by nitriding. The nitrogen-rich surface layer has high hardness and load-bearing capacity, and is very well bonded to the substrate. The development of a similar surface-treatment process for aluminium alloys is clearly a desirable goal. It is therefore not surprising that many research groups worldwide have attempted to nitride aluminium. Much of this work studied pure aluminium, a material of no interest for structural applications. Previous investigations into nitriding aluminium alloys' had indifferent results. However, they have served to identify the key issues, which are the importance of a pre-cleaning steps to remove the surface oxide, of impurity control during the nitriding and the desirability of using as low a process temperature as possible. In all of these areas, our process using a low-pressure RF plasma is likely to be competitive. In view of this, we have undertaken a comparative study of a range of commercially available aluminium alloys. All treatments were carried out in the hot-wall nitriding reactor at ANSTO. The samples consist of disks 25mm in diameter and ∼3mm thick which were polished and ultrasonically cleaned in alcohol prior to treatment. The samples were stored in air at all times except when in the nitriding reactor. In a series of treatments, the treatment time was varied in the range 1-16 h and the temperature in the range 350-500 deg C. All treatments were preceeded by a plasma cleaning step in a H 2 /50%Ar mixture for a duration of 1.5-2.0 h while the reactor reached processing temperature. The treatments all used pure N 2 at a pressure of 0.4Pa and a nitrogen flow rate of 12μmol s -1 , with 245W of rf power at 13.56MHz applied to

  9. Fast, kinetically self-consistent simulation of RF modulated plasma boundary sheaths

    International Nuclear Information System (INIS)

    Shihab, Mohammed; Ziegler, Dennis; Brinkmann, Ralf Peter

    2012-01-01

    A mathematical model is presented which enables the efficient, kinetically self-consistent simulation of RF modulated plasma boundary sheaths in all technically relevant discharge regimes. It is defined on a one-dimensional geometry where a Cartesian x-axis points from the electrode or wall at x E ≡ 0 towards the plasma bulk. An arbitrary endpoint x B is chosen ‘deep in the bulk’. The model consists of a set of kinetic equations for the ions, Boltzmann's relation for the electrons and Poisson's equation for the electrical field. Boundary conditions specify the ion flux at x B and a periodically—not necessarily harmonically—modulated sheath voltage V(t) or sheath charge Q(t). The equations are solved in a statistical sense. However, it is not the well-known particle-in-cell (PIC) scheme that is employed, but an alternative iterative algorithm termed ensemble-in-spacetime (EST). The basis of the scheme is a discretization of the spacetime, the product of the domain [x E , x B ] and the RF period [0, T]. Three modules are called in a sequence. A Monte Carlo module calculates the trajectories of a large set of ions from their start at x B until they reach the electrode at x E , utilizing the potential values on the nodes of the spatio-temporal grid. A harmonic analysis module reconstructs the Fourier modes n im (x) of the ion density n i (x, t) from the calculated trajectories. A field module finally solves the Boltzmann-Poisson equation with the calculated ion densities to generate an updated set of potential values for the spatio-temporal grid. The iteration is started with the potential values of a self-consistent fluid model and terminates when the updates become sufficiently small, i.e. when self-consistency is achieved. A subsequent post-processing determines important quantities, in particular the phase-resolved and phase-averaged values of the ion energy and angular distributions and the total energy flux at the electrode. A drastic reduction of the

  10. Optical characteristics of a RF DBD plasma jet in various {Ar}/ {O}_{2}Ar/O2 mixtures

    Science.gov (United States)

    Falahat, A.; Ganjovi, A.; Taraz, M.; Ravari, M. N. Rostami; Shahedi, A.

    2018-02-01

    In this paper, using the optical emission spectroscopy (OES) technique, the optical characteristics of a radiofrequency (RF) plasma jet are examined. The Ar/O2 mixture is taken as the operational gas and, the Ar percentage in the Ar/O2 mixture is varied from 70% to 95%. Using the optical emission spectrum analysis of the RF plasma jet, the excitation temperature is determined based on the Boltzmann plot method. The electron density in the plasma medium of the RF plasma jet is obtained by the Stark broadening of the hydrogen Balmer H_{β }. It is mostly seen that, the radiation intensity of Ar 4p→ 4s transitions at higher argon contributions in Ar/O2 mixture is higher. It is found that, at higher Ar percentages, the emission intensities from atomic oxygen (O) are higher and, the line intensities from the argon atoms and ions including O atoms linearly increase. It is observed that the quenching of Ar^{*} with O2 results in higher O species with respect to O2 molecules. In addition, at higher percentages of Ar in the Ar/O2 mixture, while the excitation temperature is decreased, the electron density is increased.

  11. Temporally resolved ozone distribution of a time modulated RF atmospheric pressure argon plasma jet: flow, chemical reaction, and transient vortex

    International Nuclear Information System (INIS)

    Zhang, S; Sobota, A; Van Veldhuizen, E M; Bruggeman, P J

    2015-01-01

    The ozone density distribution in the effluent of a time modulated RF atmospheric pressure plasma jet (APPJ) is investigated by time and spatially resolved by UV absorption spectroscopy. The plasma jet is operated with an averaged dissipated power of 6.5 W and gas flow rate 2 slm argon  +2% O 2 . The modulation frequency of the RF power is 50 Hz with a duty cycle of 50%. To investigate the production and destruction mechanism of ozone in the plasma effluent, the atomic oxygen and gas temperature is also obtained by TALIF and Rayleigh scattering, respectively. A temporal increase in ozone density is observed close to the quartz tube exit when the plasma is switched off due to the decrease in O density and gas temperature. Ozone absorption at different axial positions indicates that the ozone distribution is dominated by the convection induced by the gas flow and allows estimating the on-axis local gas velocity in the jet effluent. Transient vortex structures occurring during the switch on and off of the RF power also significantly affect the ozone density in the far effluent. (paper)

  12. MESSENGER Spacecraft Phase Scintillation due to Plasma ductting effect on RF beam propagation at Superior Solar Conjunction

    Science.gov (United States)

    Mosavi, N.; Sequeira, H.; Copeland, D.; Menyuk, C.

    2017-12-01

    We investigate the evolution of a radio frequency (RF) X-band signal as it propagates through the solar corona turbulence in superior solar conjunction at low Sun-Earth-Probe (SEP) angles.Data that was obtained during several MESSENGER (MErcury Surface, Space ENivornment, GEochmeisty, and Ranging) conjunctions reveal a short-term and long-term effect. Amplitude scintillation is evident on a short time scale. Phase scintillations are stronger, but occur over a longer time scale. We examine different possible phenomena in the solar plasma that could be the source of the different time scales of the amplitude and phase scintillations. We propose a theoretical model in which the amplitude scintillations are due to local fluctuations of the index of refraction that scatter the RF signal. These rapidly varying fluctuations randomly attenuate the signal without affecting its phase. By contrast, we propose a model in which phase fluctuations are due to long ducts in the solar plasma, streaming from the sun, that trap some parts of the RF signal. These ducts act as waveguides, changing the phase velocity of the RF beam as it travels a zigzag path inside a duct. When the radiated wave exits from a duct, its phase is changed with respect to the signal that did not pass through the duct, which can lead to destructive interference and carrier suppression. The trapping of the wave is random in nature and can be either a fast or slow process. The predictions of this model are consistent with observations.

  13. Etching of uranium dioxide in nitrogen trifluoride RF plasma glow discharge

    Science.gov (United States)

    Veilleux, John Mark

    1999-10-01

    A series of room temperature, low pressure (10.8 to 40 Pa), low power (25 to 210 W) RF plasma glow discharge experiments with UO2 were conducted to demonstrate that plasma treatment is a viable method for decontaminating UO2 from stainless steel substrates. Experiments were conducted using NF3 gas to decontaminate depleted uranium dioxide from stainless-steel substrates. Results demonstrated that UO2 can be completely removed from stainless-steel substrates after several minutes processing at under 200 W. At 180 W and 32.7 Pa gas pressure, over 99% of all UO2 in the samples was removed in just 17 minutes. The initial etch rate in the experiments ranged from 0.2 to 7.4 mum/min. Etching increased with the plasma absorbed power and feed gas pressure in the range of 10.8 to 40 Pa. A different pressure effect on UO2 etching was also noted below 50 W in which etching increased up to a maximum pressure, ˜23 Pa, then decreased with further increases in pressure. A computer simulation, CHEMKIN, was applied to predict the NF3 plasma species in the experiments. The code was validated first by comparing its predictions of the NF3 plasma species with mass spectroscopy etching experiments of silicon. The code predictions were within +/-5% of the measured species concentrations. The F atom radicals were identified as the primary etchant species, diffusing from the bulk plasma to the UO2 surface and reacting to form a volatile UF6, which desorbed into the gas phase to be pumped away. Ions created in the plasma were too low in concentration to have a major effect on etching, but can enhance the etch rate by removing non-volatile reaction products blocking the reaction of F with UO2. The composition of these non-volatile products were determined based on thermodynamic analysis and the electronic structure of uranium. Analysis identified possible non-volatile products as the uranium fluorides, UF2-5, and certain uranium oxyfluorides UO2F, UO2F2, UOF3, and UOF 4 which form over the

  14. Toward Plasma-Assisted Ignition in Scramjets

    National Research Council Canada - National Science Library

    Jacobsen, Lance S; Carter, Campbell D; Baurie, Robert A; Jackson, Thomas A

    2003-01-01

    .... The two plasma torches currently under investigation consist of a DC constricted-arc design from the Virginia Polytechnic Institute and State University and an AC unconstricted-arc design based...

  15. Deposition of nanostructured fluorocarbon plasma polymer films by RF magnetron sputtering of polytetrafluoroethylene

    Energy Technology Data Exchange (ETDEWEB)

    Kylian, Ondrej, E-mail: ondrej.kylian@gmail.com; Drabik, Martin; Polonskyi, Oleksandr; Cechvala, Juraj; Artemenko, Anna; Gordeev, Ivan; Choukourov, Andrei; Matolinova, Iva; Slavinska, Danka; Biederman, Hynek, E-mail: bieder@kmf.troja.mff.cuni.cz

    2011-07-29

    The RF magnetron sputtering of polytetrafluoroethylene target is studied with the aim to find out conditions leading to the deposition of super-hydrophobic thin films. It is shown that such coatings can be prepared at elevated pressures and a longer distance between the sputtered target and the substrate. This is explained by an increase in the density of longer C{sub x}F{sub y} molecules that reach the substrate and a lower flux of ions and CF{sub 2} radicals on the surface of growing film under such deposition conditions, as observed by optical emission spectroscopy and mass spectrometry. Such changes in plasma composition result in a deposition of rough films having F/C ratio close to 2 as observed by scanning electron microscopy and X-ray photoelectron spectroscopy, respectively. These findings clearly distinguish our results from the previous investigations of polytetrafluoroethylene sputtering performed at shorter distances from the target, where either low F/C ratio or low roughness of the deposited films did not allow reaching super-hydrophobic character of the coatings.

  16. A new hybrid scheme for simulations of highly collisional RF-driven plasmas

    International Nuclear Information System (INIS)

    Eremin, Denis; Hemke, Torben; Mussenbrock, Thomas

    2016-01-01

    This work describes a new 1D hybrid approach for modeling atmospheric pressure discharges featuring complex chemistry. In this approach electrons are described fully kinetically using particle-in-cell/Monte-Carlo (PIC/MCC) scheme, whereas the heavy species are modeled within a fluid description. Validity of the popular drift-diffusion approximation is verified against a ‘full’ fluid model accounting for the ion inertia and a fully kinetic PIC/MCC code for ions as well as electrons. The fluid models require knowledge of the momentum exchange frequency and dependence of the ion mobilities on the electric field when the ions are in equilibrium with the latter. To this end an auxiliary Monte-Carlo scheme is constructed. It is demonstrated that the drift-diffusion approximation can overestimate ion transport in simulations of RF-driven discharges with heavy ion species operated in the γ mode at the atmospheric pressure or in all discharge simulations for lower pressures. This can lead to exaggerated plasma densities and incorrect profiles provided by the drift-diffusion models. Therefore, the hybrid code version featuring the full ion fluid model should be favored against the more popular drift-diffusion model, noting that the suggested numerical scheme for the former model implies only a small additional computational cost. (paper)

  17. Decomposition of SF6-R134a effluents by RF plasma

    International Nuclear Information System (INIS)

    Joshi, Avinash V.

    2012-01-01

    The efficiency of recovery achieved by open or closed loop extraction of RPC exhaust gases is in the range of 90-95% under optimum conditions. For a large detector setup operating on one volume change per day basis, a 5% loss amounts to discharging 50 kg of R134a and 0.5 kg of SF 6 into atmosphere every day. The emissions are equivalent to create nearly 50 000 m 3 of carbon dioxide daily. The gas emissions need to be completely converted to safer compounds. The gases such as R134a and SF 6 are stable compounds. In order to decompose these, the mixture is first activated by adding of 50% oxygen and 2% argon and under typical RF plasma conditions of 13.56 MHz, 1 Torr pressure and 0.2 W/cm 2 power density. The chemical reaction takes place on the surface of a silicon electrode. The product of the reaction is mainly SiF 4 (gas), which is further hydrolyzed to form HF solution and silicon hydroxide sludge. More than 90% of the effluent gas mixture can be effectively removed by this method.

  18. Titanium dioxide (TIO2) thin film and plasma properties in RF magnetron sputtering

    International Nuclear Information System (INIS)

    Ali, Riyaz Ahmad Mohamed; Nayan, Nafarizal

    2013-01-01

    Lately, titanium dioxide (TiO 2 ) films with anatase crystalline property received numerous attentions as unique material properties. There are wide applications of TiO 2 thin film such as for photocatalytic application in solar cell. In the present study, radio frequency (RF) magnetron sputtering technique has been used to produce high dense, homogeneously controllable film layer at low deposition temperature using titanium (Ti) target. The diameter of the Ti target is 3 inch with fixed discharge power of 400W. Magnetron sputtering plasma has been produced in high purity 99.99% Argon (Ar) and 99.99% Oxygen (O 2 ) environment pressure ranging from 5 to 20 mTorr. The TiO2 were growth on silicon and glass substrates. Substrate temperature during deposition was kept constant at 400°C. The distance between target and substrate holder was maintain at 14 cm with rotation of 10 rotation-per-minutes. Our X-ray diffraction result, shows anatase crystalline successfully formed with characterization peaks of plane (101) at 2θ = 25.28°, plane (202) at 2θ = 48.05° and plane (211) at 2θ = 55.06°. In addition, it is our interest to study the plasma properties and optical spectrum of Ti, Ti+ , O- , ArM and Ar+ in the chamber during the deposition process. Result of emission line intensities, electron density and temperature from optical spectroscope and Langmuir probe will be discuss further during the workshop. This works were supported by Graduate Incentive Scheme of Universiti Tun Hussein Onn Malaysia (UTHM) and Fundamental Research Grant Scheme of Ministry of Higher Education, Malaysia. (author)

  19. Passivation of Ge/high-κ interface using RF Plasma nitridation

    Science.gov (United States)

    Dushaq, Ghada; Nayfeh, Ammar; Rasras, Mahmoud

    2018-01-01

    In this paper, plasma nitridation of a germanium surface using NH3 and N2 gases is performed with a standard RF-PECVD method at a substrate temperature of 250 °C. The structural and optical properties of the Ge surface have been investigated using Atomic Force Microscopy (AFM), Fourier Transform Infrared Spectroscopy (FT-IR), and Variable Angle Spectroscopic Ellipsometery (VASE). Study of the Ge (100) surface revealed that it is nitrated after plasma treatment while the GeO2 regrowth on the surface has been suppressed. Also, stability of the treated surface under air exposure is observed, where all the measurements were performed at room ambient. The electrical characteristics of fabricated Al/Ti/HfO2/GeON/p-Ge capacitors using the proposed surface treatment technique have been investigated. The C-V curves indicated a negligible hysteresis compared to ˜500 mV observed in untreated samples. Additionally, the C-V characteristic is used to extract the high-κ/Ge interface trap density using the most commonly used methods in determining the interface traps. The discussion includes the Dit calculation from the high-low frequency (Castagné-Vapaille) method and Terman (high-frequency) method. The high-low frequency method indicated a low interface trap density of ˜2.5 × 1011 eV-1.cm-2 compared to the Terman method. The J-V measurements revealed more than two orders of magnitude reduction of the gate leakage. This improved Ge interface quality is a promising low-temperature technique for fabricating high-performance Ge MOSFETs.

  20. Nonlinear electrostatic ion cyclotron waves in an rf-plugged inhomogeneous plasma slab

    International Nuclear Information System (INIS)

    Ikemura, Tsutomu.

    1977-01-01

    A theory based on the fluid and perturbation theories is developed to analytically study a nonlinear electrostatic ion cyclotron wave excited in an rf-plugged inhomogeneous plasma slab by applying a pair of external potentials phi sub(ext)(x,z) = +-PHI 0 cos ω 0 t.exp(-z 2 /2h 2 ) at its boundaries x = +-L. Here, B 0 is applied along the z-axis. The potential forms of the fundamental and the nonlinear second harmonic are found as functions of x, z and t provided the field-free densities vary as exp(-x 2 /2d 2 )(d 2 /h 2 0 ) created by the fundamental potential can approximately be regarded as a dipole field, provided that /1-μ/ 0 2 -ω sub(cl)sup(2))m sub(i)d 2 /(γ sub(i)T sub(i)+Z γ sub(e)T sub(e)). Under the stricter condition μ asymptotically equals 1, a dipole-like electric field can also be excited in the entire region for the case of high density and weak nonlinearity. It is shown that the assumption ω 0 -1 √ γ sub(e)T sub(e)/m sub(e) can lead to the Boltzmann relation for the electron fluid even in inhomogeneous plasmas. Moreover, the density depletion delta N sub(i) obtained here contains a new considerable term proportional to /phi/ 2 , in addition to the usual term proportional to -/delta phi/delta x/ 2 which originates from the ponderomotive force. (auth.)

  1. Direct synthesis of nano-sized glass powders with spherical shape by RF (radio frequency) thermal plasma

    International Nuclear Information System (INIS)

    Seo, J.H.; Kim, J.S.; Lee, M.Y.; Ju, W.T.; Nam, I.T.

    2011-01-01

    A new route for obtaining very small, spheroid glass powders is demonstrated using an RF (radio frequency) thermal plasma system. During the process, four kinds of chemicals, here SiO 2 , B 2 O 3 , BaCO 3 , and K 2 CO 3 , were mixed at pre-set weight ratios, spray-dried, calcined at 250 deg. C for 3 h, and crushed into fragments. Then, they were successfully reformed into nano-sized amorphous powders (< 200 nm) with spherical shape by injecting them along the centerline of an RF thermal plasma reactor at ∼ 24 kW. The as-synthesized powders show negligible (< 1%) composition changes when compared with the injected precursors of raw material compounds.

  2. Spatio-temporal powder formation and trapping in RF silane plasmas using 2-D polarization-sensitive laser scattering

    International Nuclear Information System (INIS)

    Dorier, J.L.; Hollenstein, C.; Howling, A.A.

    1994-09-01

    Powder formation studies in deposition plasmas are motivated by the need to reduce contamination in the plasma and films. Models for the force acting upon particles in rf discharges suffer from a lack of quantitative experimental data for comparison in the case of silane-containing plasmas. In this work, a cross-section of the parallel-plate capacitor discharge is illuminated with a polarized beam-expanded laser and global spatio-temporal scattered light and extinction are recorded by CCD cameras. Spatially-regular periodic bright/dark zones due to constructive/destructive Mie interference are visible over large regions of the powder layers, which shows the uniform nature of particle growth in silane plasmas. For particles trapped in an argon plasma, as for steady-state conditions in silane, spatial size segregation is demonstrated by fringes which reverse according to the polarisation of scattered light. The method allow a self-consistent estimation of particle size and number density throughout the discharge volume from which strong particle Coulomb coupling (Γ>40) is suggested to influence powder dynamics. Correction must be made to the plasma emission profile for the extinction by powder. In conclusion, this global diagnostics improves understanding of particle growth and dynamics in silane rf discharges and provides experimental input for testing the validity of models. (author) 6 figs., 43 refs

  3. Excitation of surface waves and electrostatic fields by a RF (radiofrequency systems) wave in a plasma sheath with current

    International Nuclear Information System (INIS)

    Gutierrez Tapia, C.

    1990-01-01

    It is shown in a one-dimensional model that when a current in a plasma sheath is present, the excitation of surface waves and electrostatic fields by a RF wave is possible in the sheath. This phenomena depends strongly on the joint action of Miller's and driven forces. It is also shown that the action of these forces are carried out at different characteristic times when the wave front travels through the plasma sheath. The influence of the current, in the steady limit, is taken into account by a small functional variation of the density perturbations and generated electrostatic field. (Author)

  4. Plasma assisted surface treatments of biomaterials.

    Science.gov (United States)

    Minati, L; Migliaresi, C; Lunelli, L; Viero, G; Dalla Serra, M; Speranza, G

    2017-10-01

    The biocompatibility of an implant depends upon the material it is composed of, in addition to the prosthetic device's morphology, mechanical and surface properties. Properties as porosity and pore size should allow, when required, cells penetration and proliferation. Stiffness and strength, that depend on the bulk characteristics of the material, should match the mechanical requirements of the prosthetic applications. Surface properties should allow integration in the surrounding tissues by activating proper communication pathways with the surrounding cells. Bulk and surface properties are not interconnected, and for instance a bone prosthesis could possess the necessary stiffness and strength for the application omitting out prerequisite surface properties essential for the osteointegration. In this case, surface treatment is mandatory and can be accomplished using various techniques such as applying coatings to the prosthesis, ion beams, chemical grafting or modification, low temperature plasma, or a combination of the aforementioned. Low temperature plasma-based techniques have gained increasing consensus for the surface modification of biomaterials for being effective and competitive compared to other ways to introduce surface functionalities. In this paper we review plasma processing techniques and describe potentialities and applications of plasma to tailor the interface of biomaterials. Copyright © 2017 Elsevier B.V. All rights reserved.

  5. About of the Electrostatic fields excitation theory by a RF wave in a plasma; Acerca de la teoria de excitacion de campos electrostaticos por una onda de rf en un plasma

    Energy Technology Data Exchange (ETDEWEB)

    Gutierrez T, C.R

    1991-01-15

    In an unidimensional model is shown in the cases of a semi limited plasma and a layer of plasma the excitement mechanism of electrostatic fields for a radiofrequency wave (RF) polarized lineally. This phenomenon depends strongly on the combined action of the Miller force and that of impulsion. It is shown that the action of these forces is carried out in different characteristic times when the front of wave crosses through the plasma. The cases of a semi limited plasma and of a layer of plasma without and with current are analyzed. It is shown that near the frontiers of the plasma where the field is sufficiently big arise oscillations of the width of the field that are slowly muffled in the space in an exponential way. In the cases of a plasma layer its are shown that the processes that arise near the frontier x = L are similar to the processes that arise near the frontier x = 0. The existence of current in the plasma layer leads to the blockade of the excited perturbations in the frontier x = L. (Author)

  6. Measurement of ion temperature and flow in RF start-up plasmas in TST-2 and LATE

    International Nuclear Information System (INIS)

    Tsuda, Shintaro; Ejiri, Akira; Takase, Yuichi; Tsujii, Naoto; Takeuchi, Toshihiro; Tanaka, Hitoshi; Uchida, Masaki; Maekawa, Takashi

    2015-01-01

    The ion temperature and flow of RF start-up plasmas in TST-2 and LATE were measured using a visible spectrometer. The plasma currents were 9 kA and 8 kA, respectively. The typical ion temperatures T i and toroidal flow V ϕ were 4 eV and 1 km/s, respectively, in the TST-2 plasma sustained by the lower hybrid wave (20 kW) and T i ∼ 10 eV and V ϕ ∼ 5 km/s in the LATE plasma sustained by the electron cyclotron wave (50 kW). The poloidal flow velocities were comparable to the toroidal velocities. The ion temperatures were relatively high and the ion orbit loss can be significant. (author)

  7. Profiles of plasma parameters and density of negative hydrogen ions by laser detachment measurements in RF-driven ion sources

    International Nuclear Information System (INIS)

    Christ-Koch, Sina

    2007-01-01

    This work shows the application of the Laserdetachment method for spatially resolved measurements of negative Hydrogen/Deuterium ion density. It was applied on a high power low pressure RF-driven ion source. The Laser detachment method is based on the measurement of electron currents on a positively biased Langmuir probe before and during/after a laser pulse. The density ratio of negative ions to electrons can be derived from the ratio of currents to the probe. The absolute density of negative ions can be obtained when the electron density is measured with the standard Langmuir probe setup. Measurements with the Langmuir probe additionally yield information about the floating and plasma potential, the electron temperature and the density of positive ions. The Laser detachment setup had to be adapted to the special conditions of the RF-driven source. In particular the existence of RF fields (1 MHz), high source potential (-20 kV), magnetic fields (∝ 7 mT) and caesium inside the source had to be considered. The density of negative ions could be identified in the range of n(H - )=1.10 17 1/m 3 , which is in the same order of magnitude as the electron density. Only the application of the Laser detachment method with the Langmuir probe measurements will yield spatially resolved plasma parameters and H- density profiles. The influence of diverse external parameters, such as pressure, RF-power, magnetic fields on the plasma parameters and their profiles were studied and explained. Hence, the measurements lead to a detailed understanding of the processes inside the source. (orig.)

  8. Design and RF test result of High Power Hybrid Combiner for Helicon Wave Current Drive in KSTAR Plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Park, S. Y.; Kim, H. J.; Wi, H. H.; Wang, S. J.; Kwak, J. G. [NFRI, Daejeon (Korea, Republic of)

    2016-05-15

    200 kW RF power will be injected to plasmas through the traveling wave antenna after combining four klystrons output powers using three hybrid combiners. Each klystron produces 60 kW output at the frequency of 500 MHz. RF power combiners commonly used to divide or combine output powers for various rf and microwave applications. It is divided into several types according to the design type such as Wilkinson combiner, radial and quadrature hybrid combiner. We designed high power hybrid combiners using 6-1/8 inch coaxial line. The power combiner has many advantages such as high isolation, low insertion loss and high power handling capability. In this paper design and rf test results of high power combiners will be described. High power combiners using three coaxial hybrid couplers will be utilized for effectively combining of 500 MHz, 200 kW output powers generated by four klystrons. We have designed, fabricated, and tested a 6-1/8 inch coaxial hybrid combiners at 500 MHz for efficiently off-axis Helicon wave current drive in KSTAR. Simulation and test results of high power coaxial hybrid combiners are good agreement.

  9. Plasma-assisted catalytic ionization using porous nickel plate

    International Nuclear Information System (INIS)

    Oohara, W.; Maeda, T.; Higuchi, T.

    2011-01-01

    Hydrogen atomic pair ions, i.e., H + and H - ions, are produced by plasma-assisted catalytic ionization using a porous nickel plate. Positive ions in a hydrogen plasma generated by dc arc discharge are irradiated to the porous plate, and pair ions are produced from the back of the irradiation plane. It becomes clear that the production quantity of pair ions mainly depends on the irradiation current of positive ions and the irradiation energy affects the production efficiency of H - ions.

  10. RF plasma based selective modification of hydrophilic regions on super hydrophobic surface

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Jaehyun; Hwang, Sangyeon; Cho, Dae-Hyun [Department of Mechanical Engineering, Sungkyunkwan University, Suwon 16419 (Korea, Republic of); Hong, Jungwoo [Department of Mechanical Engineering, Graduate of Medical Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 34141 (Korea, Republic of); Shin, Jennifer H., E-mail: j_shin@kaist.ac.kr [Department of Mechanical Engineering, Graduate of Medical Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 34141 (Korea, Republic of); Byun, Doyoung, E-mail: dybyun@skku.edu [Department of Mechanical Engineering, Sungkyunkwan University, Suwon 16419 (Korea, Republic of)

    2017-02-01

    Highlights: • Simple and amenable reforming method for a substrate with disparate patterns of hydrophilic dots on super-hydrophobic surfaces is proposed. • Wettability characteristics and modification mechanism for the surfaces are conducted and revealed through SEM, AFM, WSI, and SIMS. • Several representative materials for various applications are successfully deposited. - Abstract: Selective modification and regional alterations of the surface property have gained a great deal of attention to many engineers. In this paper, we present a simple, a cost-effective, and amendable reforming method for disparate patterns of hydrophilic regions on super-hydrophobic surfaces. Uniform super-hydrophobic layer (Contact angle; CA > 150°, root mean square (RMS) roughness ∼0.28 nm) can be formed using the atmospheric radio frequency (RF) plasma on top of the selective hydrophilic (CA ∼ 70°, RMS roughness ∼0.34 nm) patterns imprinted by electrohydrodynamic (EHD) jet printing technology with polar alcohols (butyl carbitol or ethanol). The wettability of the modified surface was investigated qualitatively utilizing scanning electron microscopy (SEM), atomic force microscopy (AFM), and wavelength scanning interferometer (WSI). Secondary ion mass spectroscopy (SIMS) analysis showed that the alcohol addiction reaction changed the types of radicals on the super-hydrophobic surface. The wettability was found to depend sensitively on chemical radicals on the surface, not on surface morphology (particle size and surface roughness). Furthermore, three different kinds of representative hydrophilic samples (polystyrene nano-particle aqueous solution, Salmonella bacteria medium, and poly(3,4-ethylenediocythiophene) ink) were tested for uniform deposition onto the desired hydrophilic regions. This simple strategy would have broad applications in various research fields that require selective deposition of target materials.

  11. RF plasma based selective modification of hydrophilic regions on super hydrophobic surface

    International Nuclear Information System (INIS)

    Lee, Jaehyun; Hwang, Sangyeon; Cho, Dae-Hyun; Hong, Jungwoo; Shin, Jennifer H.; Byun, Doyoung

    2017-01-01

    Highlights: • Simple and amenable reforming method for a substrate with disparate patterns of hydrophilic dots on super-hydrophobic surfaces is proposed. • Wettability characteristics and modification mechanism for the surfaces are conducted and revealed through SEM, AFM, WSI, and SIMS. • Several representative materials for various applications are successfully deposited. - Abstract: Selective modification and regional alterations of the surface property have gained a great deal of attention to many engineers. In this paper, we present a simple, a cost-effective, and amendable reforming method for disparate patterns of hydrophilic regions on super-hydrophobic surfaces. Uniform super-hydrophobic layer (Contact angle; CA > 150°, root mean square (RMS) roughness ∼0.28 nm) can be formed using the atmospheric radio frequency (RF) plasma on top of the selective hydrophilic (CA ∼ 70°, RMS roughness ∼0.34 nm) patterns imprinted by electrohydrodynamic (EHD) jet printing technology with polar alcohols (butyl carbitol or ethanol). The wettability of the modified surface was investigated qualitatively utilizing scanning electron microscopy (SEM), atomic force microscopy (AFM), and wavelength scanning interferometer (WSI). Secondary ion mass spectroscopy (SIMS) analysis showed that the alcohol addiction reaction changed the types of radicals on the super-hydrophobic surface. The wettability was found to depend sensitively on chemical radicals on the surface, not on surface morphology (particle size and surface roughness). Furthermore, three different kinds of representative hydrophilic samples (polystyrene nano-particle aqueous solution, Salmonella bacteria medium, and poly(3,4-ethylenediocythiophene) ink) were tested for uniform deposition onto the desired hydrophilic regions. This simple strategy would have broad applications in various research fields that require selective deposition of target materials.

  12. Plasma based Ar+ beam assisted poly(dimethylsiloxane) surface modification

    International Nuclear Information System (INIS)

    Vladkova, T.G.; Keranov, I.L.; Dineff, P.D.; Youroukov, S.Y.; Avramova, I.A.; Krasteva, N.; Altankov, G.P.

    2005-01-01

    Plasma based Ar + beam performed in RF (13.56 MHz) low-pressure (200 mTorr) glow discharge (at 100 W, 1200 W and 2500 W) with a serial capacitance was employed for surface modification of poly(dimethylsiloxane) (PDMS) aimed at improvement of its interactions with living cells. The presence of a serial capacitance ensures arise of an ion-flow inside the plasma volume directed toward the treated sample and the vary of the discharge power ensures varied density of the ion-flow. XPS analysis was performed to study the changes in the surface chemical composition of the modified samples and the corresponding changes in the surface energy were monitored by contact angle measurements. We found that plasma based Ar + beam transforms the initially hydrophobic PDMS surface into a hydrophilic one mainly due to a raising of the polar component of the surface tension, this effect being most probably due to an enrichment of the modified surface layer with permanent dipoles of a [SiO x ]-based network and elimination of the original methyl groups. The initial adhesion of human fibroblast cells was studied on the described above plasma based Ar + beam modified and acrylic acid (AA) grafted or not fibronectin (FN) pre-coated or bare surfaces. The cell response seems to be related with the peculiar structure and wettability of the modified PDMS surface layer after plasma based Ar + beam treatment followed or not by AA grafting

  13. Study on the RF inductively coupled plasma spheroidization of refractory W and W-Ta alloy powders

    Science.gov (United States)

    Chenfan, YU; Xin, ZHOU; Dianzheng, WANG; Neuyen VAN, LINH; Wei, LIU

    2018-01-01

    Spherical powders with good flowability and high stacking density are mandatory for powder bed additive manufacturing. Nevertheless, the preparation of spherical refractory tungsten and tungsten alloy powders is a formidable task. In this paper, spherical refractory metal powders processed by high-energy stir ball milling and RF inductively coupled plasma were investigated. By utilizing the technical route, pure spherical tungsten powders were prepared successfully, the flowability increased from 10.7 s/50 g to 5.5 s/50 g and apparent density increased from 6.916 g cm-3 to 11.041 g cm-3. Alloying element tantalum can reduce the tendency to micro-crack during tungsten laser melting and rapid solidification process. Spherical W-6Ta (%wt) powders were prepared in this way, homogeneous dispersion of tantalum in a tungsten matrix occurred but a small amount of flake-like shape particles appeared after high-energy stir ball milling. The flake-like shape particles can hardly be spheroidized in subsequent RF inductively coupled plasma process, might result from the unique suspended state of flaky particles under complex electric and magnetic fields as well as plasma-particle heat exchange was different under various turbulence models. As a result, the flake-like shape particles cannot pass through the high-temperature area of thermal plasma torch and cannot be spheroidized properly.

  14. Plasma-Assisted Pretreatment of Wheat Straw

    DEFF Research Database (Denmark)

    Schultz-Jensen, Nadja; Leipold, Frank; Bindslev, Henrik

    2011-01-01

    O3 generated in a plasma at atmospheric pressure and room temperature, fed with dried air (or oxygen-enriched dried air), has been used for the degradation of lignin in wheat straw to optimize the enzymatic hydrolysis and to get more fermentable sugars. A fixed bed reactor was used combined...... with a CO2 detector and an online technique for O3 measurement in the fed and exhaust gas allowing continuous measurement of the consumption of O3. This rendered it possible for us to determine the progress of the pretreatment in real time (online analysis). The process time can be adjusted to produce wheat...... straw with desired lignin content because of the online analysis. The O3 consumption of wheat straw and its polymeric components, i.e., cellulose, hemicellulose, and lignin, as well as a mixture of these, dry as well as with 50% water, were studied. Furthermore, the process parameters dry matter content...

  15. First plasma experiments in Tore Supra with a new generation of high heat flux limiters for RF antennas

    International Nuclear Information System (INIS)

    Agarici, G.; Beaumont, B.; Bibet, Ph.; Bremond, S.; Bucalossi, J.; Colas, L.; Durocher, A.; Gargiulo, L.; Ladurelle, L.; Lombard, G.; Martin, G.; Mollard, P.

    2000-01-01

    During the 1997 and 1998 Tore Supra shutdown, a first set of new antenna guard limiters was installed on one of the three ion cyclotron resonance heating (ICRH) antennas of Tore Supra. This limiter, which was one of the main technological studies of the 1998 campaign, was widely experimented in real plasma conditions, thus allowing the validation in situ, for the first time, of the technology of active metal casting (AMC) for plasma facing components. The huge improvement in the thermal response of the new limiter generation, compared to the old one, is shown on plasma pulses made identical in terms of antenna position and injected RF power profile. By using the infrared cameras installed inside Tore Supra and viewing the antennas front, the power density fluxes received by the carbon fibre composite (CFC) surface of the limiter were evaluated by correlation with the heat load tests made on the electrons beam facility of CEA/Framatome

  16. Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa

    Science.gov (United States)

    Kousal, Jaroslav; Tichý, Milan; Šebek, Ondřej; Čechvala, Juraj; Biederman, Hynek

    2011-08-01

    The majority of plasma polymerization sources operate at pressures higher than 1 Pa. At these pressures most common deposition methods do not show significant directionality. One way of enhancing the directional effects is to decrease the working pressure to increase the mean free path of the reactive molecules. The plasma source used in this work was designed to study the plasma polymerization process at pressures below 0.1 Pa. The source consists of the classical radio frequency (RF) (13.56 MHz, capacitive coupled) tubular reactor enhanced by an external magnetic circuit. The working gas is introduced into the discharge by a capillary. This forms a relatively localized zone of higher pressure where the monomer is activated. Due to the magnetic field, the plasma is constricted near the axis of the reactor with nearly collisionless gas flow. The plasma parameters were obtained using a double Langmuir probe. Plasma density in the range ni = 1013-1016 m-3 was obtained in various parts of the discharge under typical conditions. The presence of the magnetic field led to the presence of relatively strong electric fields (103 V m-1) and relatively high electron energies up to several tens of eV in the plasma.

  17. Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa

    Energy Technology Data Exchange (ETDEWEB)

    Kousal, Jaroslav; Tichy, Milan; Sebek, Ondrej; Cechvala, Juraj; Biederman, Hynek, E-mail: jaroslav.kousal@mff.cuni.cz [Charles University in Prague, Faculty of Mathematics and Physics, V Holesovickach 2, 180 00, Prague 8 (Czech Republic)

    2011-08-15

    The majority of plasma polymerization sources operate at pressures higher than 1 Pa. At these pressures most common deposition methods do not show significant directionality. One way of enhancing the directional effects is to decrease the working pressure to increase the mean free path of the reactive molecules. The plasma source used in this work was designed to study the plasma polymerization process at pressures below 0.1 Pa. The source consists of the classical radio frequency (RF) (13.56 MHz, capacitive coupled) tubular reactor enhanced by an external magnetic circuit. The working gas is introduced into the discharge by a capillary. This forms a relatively localized zone of higher pressure where the monomer is activated. Due to the magnetic field, the plasma is constricted near the axis of the reactor with nearly collisionless gas flow. The plasma parameters were obtained using a double Langmuir probe. Plasma density in the range n{sub i} = 10{sup 13}-10{sup 16} m{sup -3} was obtained in various parts of the discharge under typical conditions. The presence of the magnetic field led to the presence of relatively strong electric fields (10{sup 3} V m{sup -1}) and relatively high electron energies up to several tens of eV in the plasma.

  18. Modeling of polarization phenomena due to RF sheaths and electron beams in magnetized plasma; Modelisation de phenomenes de polarisation par des gaines rf et des faisceaux electroniques dans un plasma magnetise

    Energy Technology Data Exchange (ETDEWEB)

    Faudot, E

    2005-07-01

    This work investigates the problematic of hot spots induced by accelerated particle fluxes in tokamaks. It is shown that the polarization due to sheaths in the edge plasma in which an electron beam at a high level of energy is injected, can reach several hundreds volts and thus extend the deposition area. The notion of obstructed sheath is introduced and explains the acceleration of energy deposition by the decreasing of the sheath potential. Then, a 2-dimensional fluid modeling of flux tubes in front of ICRF antennae allows us to calculate the rectified potentials taking into account RF polarization currents transverse to magnetic field lines. The 2-dimensional fluid code designed validates the analytical results which show that the DC rectified potential is 50% greater with polarization currents than without. Finally, the simultaneous application of an electron beam and a RF potential reveals that the potentials due to each phenomenon are additives when RF potential is much greater than beam polarization. The density depletion of polarized flux tubes in 2-dimensional PIC (particles in cells) simulations is characterized but not yet explained. (author)

  19. Characterization of diamond-like carbon thin film synthesized by RF atmospheric pressure plasma Ar/CH4 jet

    Science.gov (United States)

    Sohbatzadeh, Farshad; Safari, Reza; Etaati, G. Reza; Asadi, Eskandar; Mirzanejhad, Saeed; Hosseinnejad, Mohammad Taghi; Samadi, Omid; Bagheri, Hanieh

    2016-01-01

    The growth of diamond like carbon (DLC) on a Pyrex glass was investigated by a radio frequency (RF) atmospheric pressure plasma jet (APPJ). The plasma jet with capacitive configuration ran by a radio frequency power supply at 13.56 MHz. Alumina ceramic was used as dielectric barrier. Ar and CH4 were used in atmospheric pressure as carrier and precursor gases, respectively. Diamond like carbon thin films were deposited on Pyrex glass at substrate temperature and applied power of 130 °C and 250 Watts, respectively. Performing field emission scanning electron microscope (FE-SEM) and laser Raman spectroscopy analysis resulted in deposition rate and the ID/IG ratio of 21.31 nm/min and 0.47, respectively. The ID/IG ratio indicated that the coating possesses relative high sp3 content The optical emission spectroscopy (OES) diagnostic was applied to diagnose plasma jet species. Estimating electron temperature and density of the RF-APPJ resulted in 1.36 eV and 2.75 × 1014 cm-3 at the jet exit, respectively.

  20. Charge plasma based source/drain engineered Schottky Barrier MOSFET: Ambipolar suppression and improvement of the RF performance

    Science.gov (United States)

    Kale, Sumit; Kondekar, Pravin N.

    2018-01-01

    This paper reports a novel device structure for charge plasma based Schottky Barrier (SB) MOSFET on ultrathin SOI to suppress the ambipolar leakage current and improvement of the radio frequency (RF) performance. In the proposed device, we employ dual material for the source and drain formation. Therefore, source/drain is divided into two parts as main source/drain and source/drain extension. Erbium silicide (ErSi1.7) is used as main source/drain material and Hafnium metal is used as source/drain extension material. The source extension induces the electron plasma in the ultrathin SOI body resulting reduction of SB width at the source side. Similarly, drain extension also induces the electron plasma at the drain side. This significantly increases the SB width due to increased depletion at the drain end. As a result, the ambipolar leakage current can be suppressed. In addition, drain extension also reduces the parasitic capacitances of the proposed device to improve the RF performance. The optimization of length and work function of metal used in the drain extension is performed to achieve improvement in device performance. Moreover, the proposed device makes fabrication simpler, requires low thermal budget and free from random dopant fluctuations.

  1. A Penning-assisted subkilovolt coaxial plasma source

    International Nuclear Information System (INIS)

    Wang Zhehui; Beinke, Paul D.; Barnes, Cris W.; Martin, Michael W.; Mignardot, Edward; Wurden, Glen A.; Hsu, Scott C.; Intrator, Thomas P.; Munson, Carter P.

    2005-01-01

    A Penning-assisted 20 MW coaxial plasma source (plasma gun), which can achieve breakdown at sub-kV voltages, is described. The minimum breakdown voltage is about 400 V, significantly lower than previously reported values of 1-5 kV. The Penning region for electrons is created using a permanent magnet assembly, which is mounted to the inside of the cathode of the coaxial plasma source. A theoretical model for the breakdown is given. A 900 V 0.5 F capacitor bank supplies energy for gas breakdown and plasma sustainment from 4 to 6 ms duration. Typical peak gun current is about 100 kA and gun voltage between anode and cathode after breakdown is about 200 V. A circuit model is used to understand the current-voltage characteristics of the coaxial gun plasma. Energy deposited into the plasma accounts for about 60% of the total capacitor bank energy. This plasma source is uniquely suitable for studying multi-MW multi-ms plasmas with sub-MJ capacitor bank energy

  2. Structural and photoluminescence investigation on the hot-wire assisted plasma enhanced chemical vapor deposition growth silicon nanowires

    International Nuclear Information System (INIS)

    Chong, Su Kong; Goh, Boon Tong; Wong, Yuen-Yee; Nguyen, Hong-Quan; Do, Hien; Ahmad, Ishaq; Aspanut, Zarina; Muhamad, Muhamad Rasat; Dee, Chang Fu; Rahman, Saadah Abdul

    2012-01-01

    High density of silicon nanowires (SiNWs) were synthesized by a hot-wire assisted plasma enhanced chemical vapor deposition technique. The structural and optical properties of the as-grown SiNWs prepared at different rf power of 40 and 80 W were analyzed in this study. The SiNWs prepared at rf power of 40 W exhibited highly crystalline structure with a high crystal volume fraction, X C of ∼82% and are surrounded by a thin layer of SiO x . The NWs show high absorption in the high energy region (E>1.8 eV) and strong photoluminescence at 1.73 to 2.05 eV (red–orange region) with a weak shoulder at 1.65 to 1.73 eV (near IR region). An increase in rf power to 80 W reduced the X C to ∼65% and led to the formation of nanocrystalline Si structures with a crystallite size of <4 nm within the SiNWs. These NWs are covered by a mixture of uncatalyzed amorphous Si layer. The SiNWs prepared at 80 W exhibited a high optical absorption ability above 99% in the broadband range between 220 and ∼1500 nm and red emission between 1.65 and 1.95 eV. The interesting light absorption and photoluminescence properties from both SiNWs are discussed in the text. - Highlights: ► Growth of random oriented silicon nanowires using hot-wire assisted plasma enhanced chemical vapor deposition. ► Increase in rf power reduces the crystallinity of silicon nanowires. ► High density and nanocrystalline structure in silicon nanowires significant enhance the near IR light absorption. ► Oxide defects and silicon nanocrystallites in silicon nanowires reveal photoluminescence in red–orange and red regions.

  3. Observation of enhanced electric field in an RF-plugged sheet plasma in the RFC-XX-M open-ended machine

    International Nuclear Information System (INIS)

    Oda, T.; Takiyama, K.; Kadota, K.

    1987-12-01

    We report nonperturbing observation of the electric field in the sheet plasma for RF end-plugging on the RFC XX-M open-ended machine by using the Stark effect with a combined technique of beam-probe and laser-induced fluorescence. Under the optimum condition for the RF plugging, enhanced electric field is found in the sheet plasma by about 2.5 times with respect to the electric field when no plasma is produced. The field spatial profile is also measured, which is discussed in connection with the electrostatic eigenmode. (author)

  4. Assessment of quasi-linear effect of RF power spectrum for enabling lower hybrid current drive in reactor plasmas

    Science.gov (United States)

    Cesario, Roberto; Cardinali, Alessandro; Castaldo, Carmine; Amicucci, Luca; Ceccuzzi, Silvio; Galli, Alessandro; Napoli, Francesco; Panaccione, Luigi; Santini, Franco; Schettini, Giuseppe; Tuccillo, Angelo Antonio

    2017-10-01

    The main research on the energy from thermonuclear fusion uses deuterium plasmas magnetically trapped in toroidal devices. To suppress the turbulent eddies that impair thermal insulation and pressure tight of the plasma, current drive (CD) is necessary, but tools envisaged so far are unable accomplishing this task while efficiently and flexibly matching the natural current profiles self-generated at large radii of the plasma column [1-5]. The lower hybrid current drive (LHCD) [6] can satisfy this important need of a reactor [1], but the LHCD system has been unexpectedly mothballed on JET. The problematic extrapolation of the LHCD tool at reactor graded high values of, respectively, density and temperatures of plasma has been now solved. The high density problem is solved by the FTU (Frascati Tokamak Upgrade) method [7], and solution of the high temperature one is presented here. Model results based on quasi-linear (QL) theory evidence the capability, w.r.t linear theory, of suitable operating parameters of reducing the wave damping in hot reactor plasmas. Namely, using higher RF power densities [8], or a narrower antenna power spectrum in refractive index [9,10], the obstacle for LHCD represented by too high temperature of reactor plasmas should be overcome. The former method cannot be used for routinely, safe antenna operations, Thus, only the latter key is really exploitable in a reactor. The proposed solutions are ultimately necessary for viability of an economic reactor.

  5. Surface wettability and energy effects on the biological performance of poly-3-hydroxybutyrate films treated with RF plasma

    Energy Technology Data Exchange (ETDEWEB)

    Syromotina, D.S. [Department of Experimental Physics, National Research Tomsk Polytechnic University, 634050 Tomsk (Russian Federation); Surmenev, R.A., E-mail: rsurmenev@gmail.com [Department of Experimental Physics, National Research Tomsk Polytechnic University, 634050 Tomsk (Russian Federation); Fraunhofer Institute for Interfacial Engineering and Biotechnology IGB, 70569 Stuttgart (Germany); Surmeneva, M.A. [Department of Experimental Physics, National Research Tomsk Polytechnic University, 634050 Tomsk (Russian Federation); Boyandin, A.N.; Nikolaeva, E.D. [Institute of Biophysics of Siberian Branch of Russian Academy of Sciences, 50/50 Akademgorodok, Krasnoyarsk 660036 (Russian Federation); School of Fundamental Biology and Biotechnology, Siberian Federal University, 79 Svobodny pr., 660041 Krasnoyarsk (Russian Federation); Prymak, O.; Epple, M. [Inorganic Chemistry and Center for Nanointegration Duisburg-Essen (CeNIDE), University of Duisburg-Essen, 45117 Essen (Germany); Ulbricht, M. [Technical Chemistry II and Center for Nanointegration Duisburg-Essen (CeNIDE), University of Duisburg-Essen, 45141 Essen (Germany); Oehr, C. [Fraunhofer Institute for Interfacial Engineering and Biotechnology IGB, 70569 Stuttgart (Germany); Volova, T.G. [Institute of Biophysics of Siberian Branch of Russian Academy of Sciences, 50/50 Akademgorodok, Krasnoyarsk 660036 (Russian Federation); School of Fundamental Biology and Biotechnology, Siberian Federal University, 79 Svobodny pr., 660041 Krasnoyarsk (Russian Federation)

    2016-05-01

    The surface properties of poly-3-hydroxybutyrate (P3HB) membranes were modified using oxygen and an ammonia radio-frequency (RF, 13.56 MHz) plasma. The plasma treatment procedures used in the study only affected the surface properties, including surface topography, without inducing any significant changes in the crystalline structure of the polymer, with the exception being a power level of 250 W. The wettability of the modified P3HB surfaces was significantly increased after the plasma treatment, irrespective of the treatment procedure used. It was revealed that both surface chemistry and surface roughness changes caused by the plasma treatment affected surface wettability. A treatment-induced surface aging effect was observed and resulted in an increase in the water contact angle and a decrease in the surface free energy. However, the difference in the water contact angle between the polymers that had been treated for 4 weeks and the untreated polymer surfaces was still significant. A dependence between cell adhesion and proliferation and the polar component of the surface energy was revealed. The increase in the polar component after the ammonia plasma modification significantly increased cell adhesion and proliferation on biodegradable polymer surfaces compared to the untreated P3HB and the P3HB modified using an oxygen plasma. - Highlights: • Plasma treatment affected the topography of poly(3-hydroxybutyrate) (P3HB). • Plasma treatment resulted in improvement of the surface wettability. • No alteration of the bulk properties of the polymers was observed. • The ammonia plasma treatment at 150 W improved the cell adhesion and proliferation.

  6. Internal oscillating current-sustained RF plasmas: Parameters, stability, and potential for surface engineering

    DEFF Research Database (Denmark)

    Ostrikov, K.; Tsakadze, E.L.; Tsakadze, Z.L.

    2005-01-01

    . Moreover, under certain conditions, the plasma becomes unstable due to spontaneous transitions between low-density (electrostatic, E) and high-density (electromagnetic, H) operating modes. Excellent uniformity of high-density plasmas makes the plasma reactor promising for various plasma processing...... applications and surface engineering. (c) 2005 Elsevier B.V. All rights reserved....

  7. Chemical analysis of plasma-assisted antimicrobial treatment on cotton

    International Nuclear Information System (INIS)

    Kan, C W; Lam, Y L; Yuen, C W M; Luximon, A; Lau, K W; Chen, K S

    2013-01-01

    This paper explores the use of plasma treatment as a pretreatment process to assist the application of antimicrobial process on cotton fabric with good functional effect. In this paper, antimicrobial finishing agent, Microfresh Liquid Formulation 9200-200 (MF), and a binder (polyurethane dispersion, Microban Liquid Formulation R10800-0, MB) will be used for treating the cotton fabric for improving the antimicrobial property and pre-treatment of cotton fabric by plasma under atmospheric pressure will be employed to improve loading of chemical agents. The chemical analysis of the treated cotton fabric will be conducted by Fourier transform Infrared Spectroscopy.

  8. Numerical modelisation of RF waves in the ion cyclotron range of frequency for Tokamak plasmas

    International Nuclear Information System (INIS)

    Edery, D.; Picq, H.; Samain, A.; Gambier, D.J.

    1987-12-01

    The purpose of this paper is to present the numerical code ALCYON developed to compute the RF field structure in the ion cyclotron range of frequencies. The code handles fundamental and second harmonic heating while the mode conversion onto modes of decreasing wavelength is simulated by a selective power absorption on slow waves when their wavelength reaches the mesh size

  9. Plasma ``anti-assistance'' and ``self-assistance'' to high power impulse magnetron sputtering

    Science.gov (United States)

    Anders, André; Yushkov, Georgy Yu.

    2009-04-01

    A plasma assistance system was investigated with the goal to operate high power impulse magnetron sputtering (HiPIMS) at lower pressure than usual, thereby to enhance the utilization of the ballistic atoms and ions with high kinetic energy in the film growth process. Gas plasma flow from a constricted plasma source was aimed at the magnetron target. Contrary to initial expectations, such plasma assistance turned out to be contraproductive because it led to the extinction of the magnetron discharge. The effect can be explained by gas rarefaction. A better method of reducing the necessary gas pressure is operation at relatively high pulse repetition rates where the afterglow plasma of one pulse assists in the development of the next pulse. Here we show that this method, known from medium-frequency (MF) pulsed sputtering, is also very important at the much lower pulse repetition rates of HiPIMS. A minimum in the possible operational pressure is found in the frequency region between HiPIMS and MF pulsed sputtering.

  10. Plasma 'anti-assistance' and 'self-assistance' to high power impulse magnetron sputtering

    International Nuclear Information System (INIS)

    Anders, Andre; Yushkov, Georgy Yu.

    2009-01-01

    A plasma assistance system was investigated with the goal to operate high power impulse magnetron sputtering (HiPIMS) at lower pressure than usual, thereby to enhance the utilization of the ballistic atoms and ions with high kinetic energy in the film growth process. Gas plasma flow from a constricted plasma source was aimed at the magnetron target. Contrary to initial expectations, such plasma assistance turned out to be contraproductive because it led to the extinction of the magnetron discharge. The effect can be explained by gas rarefaction. A better method of reducing the necessary gas pressure is operation at relatively high pulse repetition rates where the afterglow plasma of one pulse assists in the development of the next pulse. Here we show that this method, known from medium-frequency (MF) pulsed sputtering, is also very important at the much lower pulse repetition rates of HiPIMS. A minimum in the possible operational pressure is found in the frequency region between HiPIMS and MF pulsed sputtering

  11. RF plasma deposition of thin SixGeyCz:H films using a combination of organometallic source materials

    International Nuclear Information System (INIS)

    Rapiejko, C.; Gazicki-Lipman, M.; Klimek, L.; Szymanowski, H.; Strojek, M.

    2004-01-01

    Elements of the IV group of periodic table have been strongly present in the fast development of PECVD techniques for the last two decades at least. As a result, deposition technologies of such materials as a-Si:H, a-C:H, mμ-C:H or DLC have been successfully established. What has followed is an ever growing interest in binary systems of the A x (IV)B y (IV):H kind. One possible way to deposit such systems is to use organosilicon compounds (to deposit Si x C y :H films) or organogermanium compounds (to deposit Ge x C y :H films), as source substances. The present paper reports on a RF plasma deposition of a Si x Ge y C z :H ternary system, using a combination of organosilicon and organogermanium compounds. Thin Si/Ge/C films have been fabricated in a small volume (ca. 2 dm 3 ) parallel plate RF plasma reactor using, as a source material, a combination of tetramethylsilane (TMS) and tetramethylgermanium (TMG) vapours carried by argon. SEM investigations reveal a continuous compact character of the coatings and their uniform thickness. The elemental composition of the films has been studied using EDX analysis. The results of the analysis show that the elemental composition of the films can be controlled by both the TMG/TMS ratio of the initial mixture and the RF power input. Ellipsometric measurements show good homogeneity of these materials. Chemical bonding in the films has been studied using the FTIR technique. Bandgap calculations have been carried out using ellipsometric data and by applying both the Tauc law and the Moss approach

  12. Surface improvement and biocompatibility of TiAl{sub 24}Nb{sub 10} intermetallic alloy using rf plasma nitriding

    Energy Technology Data Exchange (ETDEWEB)

    Abd El-Rahman, A.M. [Physics Department, Faculty of Science, Sohag University (Egypt)], E-mail: ahmedphys96@hotmail.com; Maitz, M.F. [Institut fuer Ionenstrahlphysik und Materialforschung, Forschungszentrum Dresden Rossendorf (Germany); Kassem, M.A. [Department of Materials and Metals Engineering, Faculty of Petroleum and Mining Engineering, Suez Canal University (Egypt); El-Hossary, F.M. [Physics Department, Faculty of Science, Sohag University (Egypt); Prokert, F.; Reuther, H.; Pham, M.T.; Richter, E. [Institut fuer Ionenstrahlphysik und Materialforschung, Forschungszentrum Dresden Rossendorf (Germany)

    2007-09-30

    The present work describes the surface improvement and biocompatibility of TiAl{sub 24}Nb{sub 10} intermetallic alloy using rf plasma nitriding. The nitriding process was carried out at different plasma power from 400 W to 650 W where the other plasma conditions were fixed. Grazing incidence X-ray diffractometry (GIXRD), Auger electron spectroscopy (AES), tribometer and a nanohardness tester were employed to characterize the nitrided layer. Further potentiodynamic polarization method was used to describe the corrosion behavior of the un-nitrided and nitrided alloy. It has been found that the Vickers hardness (HV) and corrosion resistance values of the nitrided layers increase with increasing plasma power while the wear rates of the nitrided layers reduce by two orders of magnitude as compared to those of the un-nitrided layer. This improvement in surface properties of the intermetallic alloy is due to formation of a thin modified layer which is composed of titanium nitride in the alloy surface. Moreover, all modified layers were tested for their sustainability as a biocompatible material. Concerning the application area of biocompatibility, the present treated alloy show good surface properties especially for the nitrided alloy at low plasma power of 400 W.

  13. Influence of DC arc jets on flow fields analyzed by an integrated numerical model for a DC-RF hybrid plasma

    International Nuclear Information System (INIS)

    Seo, Jun Ho; Park, Jin Myung; Hong, Sang Hee

    2008-01-01

    The influence of DC arc jets on the flow fields in a hybrid plasma torch is numerically analyzed by an integrated direct current-radio frequency (DC-RF) plasma model based on magneto-hydrodynamic formulations. The calculated results reveal that the increase in DC arc gas flow rate raises the axial flow velocity along the central column of the DC-RF hybrid plasma together with the enhanced backflow streams in the peripheral wall region. The temperature profiles on the torch exit plane are little affected due to the reheating process of the central column by the combined RF plasma. Accordingly, the exit enthalpy emitted from the DC-RF hybrid torch can be concentrated to the central column of the plasma and controlled by adjusting the DC arc gas flow rate. The swirl in the sheath gas flow turns out to have the opposite effect on the DC arc gas flow rate. The swirling motion of the sheath gas can reduce the back flows near the induction tube wall as well as the axial velocities in the central column of the plasma. Accordingly, the swirl in the sheath gas flow can be used for the functional operation of the DC-RF hybrid plasma along with the DC arc gas flow rate to suppress the back flows at the wall region and to reduce the excessive interactions between the DC arc jet and the ambient RF plasmas. The effects of DC input current on the flow fields of hybrid plasma are similar to those of the DC arc gas flow rate, but the axial velocities for the higher current relatively quickly decay along the centerline. This is in contrast to the increase in the axial velocity remaining in proportion to the increase in the DC arc gas flow rate all the way up to the exit of the DC-RF hybrid plasma. Accordingly, the present integrated numerical analysis suggests that the hybrid plasma field profiles and the entrainment of ambient air from the torch exit are controllable by adjusting the DC arc gas flow rate, the DC input current and swirl in the sheath gas flow taking advantage of

  14. Low temperature RF plasma nitriding of self-organized TiO2 nanotubes for effective bandgap reduction

    Science.gov (United States)

    Bonelli, Thiago Scremin; Pereyra, Inés

    2018-06-01

    Titanium dioxide is a widely studied semiconductor material found in many nanostructured forms, presenting very interesting properties for several applications, particularly photocatalysis. TiO2 nanotubes have a high surface-to-volume ratio and functional electronic properties for light harvesting. Despite these manifold advantages, TiO2 photocatalytic activity is limited to UV radiation due to its large band gap. In this work, TiO2 nanotubes produced by electrochemical anodization were submitted to plasma nitriding processes in a PECVD reactor. The plasma parameters were evaluated to find the best conditions for gap reduction, in order to increase their photocatalytic activity. The pressure and RF power density were varied from 0.66 to 2.66 mbar and 0.22 to 3.51 W/cm2 respectively. The best gap reduction, to 2.80 eV, was achieved using a pressure of 1.33 mbar and 1.75 W/cm2 RF power at 320 °C, during a 2-h process. This leads to a 14% reduction in the band gap value and an increase of 25.3% in methylene blue reduction, doubling the range of solar photons absorption from 5 to 10% of the solar spectrum.

  15. CoPt/TiN films nanopatterned by RF plasma etching towards dot-patterned magnetic media

    Science.gov (United States)

    Szívós, János; Pothorszky, Szilárd; Soltys, Jan; Serényi, Miklós; An, Hongyu; Gao, Tenghua; Deák, András; Shi, Ji; Sáfrán, György

    2018-03-01

    CoPt thin films as possible candidates for Bit Patterned magnetic Media (BPM) were prepared and investigated by electron microscopy techniques and magnetic measurements. The structure and morphology of the Direct Current (DC) sputtered films with N incorporation were revealed in both as-prepared and annealed state. Nanopatterning of the samples was carried out by means of Radio Frequency (RF) plasma etching through a Langmuir-Blodgett film of silica nanospheres that is a fast and high throughput technique. As a result, the samples with hexagonally arranged 100 nm size separated dots of fct-phase CoPt were obtained. The influence of the order of nanopatterning and anneling on the nanostructure formation was revealed. The magnetic properties of the nanopatterned fct CoPt films were investigated by Vibrating Sample Magnetometer (VSM) and Magnetic Force Microscopy (MFM). The results show that CoPt thin film nanopatterned by means of the RF plasma etching technique is promising candidate to a possible realization of BPM. Furthermore, this technique is versatile and suitable for scaling up to technological and industrial applications.

  16. Plasma and Ion Assistance in Physical Vapor Deposition: AHistorical Perspective

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2007-02-28

    Deposition of films using plasma or plasma-assist can betraced back surprisingly far, namely to the 18th century for arcs and tothe 19th century for sputtering. However, only since the 1960s thecoatings community considered other processes than evaporation for largescale commercial use. Ion Plating was perhaps the first importantprocess, introducing vapor ionization and substrate bias to generate abeam of ions arriving on the surface of the growing film. Ratherindependently, cathodic arc deposition was established as an energeticcondensation process, first in the former Soviet Union in the 1970s, andin the 1980s in the Western Hemisphere. About a dozen various ion-basedcoating technologies evolved in the last decades, all characterized byspecific plasma or ion generation processes. Gridded and gridless ionsources were taken from space propulsion and applied to thin filmdeposition. Modeling and simulation have helped to make plasma and ionseffects to be reasonably well understood. Yet--due to the complex, oftennon-linear and non-equilibrium nature of plasma and surfaceinteractions--there is still a place for the experience plasma"sourcerer."

  17. Commercialization of Plasma-Assisted Technologies: The Indian Experience

    Science.gov (United States)

    John, P. I.

    The paper describes an initiative by the Institute for Plasma Research (IPR), India in establishing links with the Indian industry for developing and commercialising advanced plasma-based industrial technologies. This has culminated in the creation of a self-financing technology development, incubation, demonstration and delivery facility. A business plan for converting the knowledge base to commercially viable technologies conceived technology as a product and the industry as the market and addressed issues like resistance to new technologies, the key role of entrepreneur, thrust areas and the necessity of technology incubation and delivery. Success of this strategy is discussed in a few case studies. We conclude by identifying the cost, environmental, strategic and techno-economic aspects, which would be the prime drivers for plasma-assisted manufacturing technology in India.

  18. Plasma assisted surface coating/modification processes: An emerging technology

    Science.gov (United States)

    Spalvins, T.

    1986-01-01

    A broad understanding of the numerous ion or plasma assisted surface coating/modification processes is sought. An awareness of the principles of these processes is needed before discussing in detail the ion nitriding technology. On the basis of surface modifications arising from ion or plasma energizing and interactions, it can be broadly classified as deposition of distinct overlay coatings (sputtering-dc, radio frequency, magnetron, reactive; ion plating-diode, triode) and surface property modification without forming a discrete coating (ion implantation, ion beam mixing, laser beam irradiation, ion nitriding, ion carburizing, plasma oxidation). These techniques offer a great flexibility and are capable in tailoring desirable chemical and structural surface properties independent of the bulk properties.

  19. Plasma assisted surface coating/modification processes - An emerging technology

    Science.gov (United States)

    Spalvins, T.

    1987-01-01

    A broad understanding of the numerous ion or plasma assisted surface coating/modification processes is sought. An awareness of the principles of these processes is needed before discussing in detail the ion nitriding technology. On the basis of surface modifications arising from ion or plasma energizing and interactions, it can be broadly classified as deposition of distinct overlay coatings (sputtering-dc, radio frequency, magnetron, reactive; ion plating-diode, triode) and surface property modification without forming a discrete coating (ion implantation, ion beam mixing, laser beam irradiation, ion nitriding, ion carburizing, plasma oxidation. These techniques offer a great flexibility and are capable in tailoring desirable chemical and structural surface properties independent of the bulk properties.

  20. Dust particle charge and screening in the collisional RF plasma sheath

    NARCIS (Netherlands)

    Beckers, J.; Trienekens, D.J.M.; Kroesen, G.M.W.; Sprouse, G.D.

    2012-01-01

    Once immersed in plasma, a dust particle gathers a highly negative charge due to the net collection of free electrons. In most plasma's on earth and with particle sizes is in the micrometer range, the gravitational force is dominant and consequently the particle ends up within the plasma sheath

  1. Basic study on the generation of RF plasmas in premixed oxy-combustion with methane

    International Nuclear Information System (INIS)

    Osaka, Yugo; Razzak, M.A.; Kobayashi, Noriyuki; Ohno, Noriyasu; Takamura, Shuichi; Uesugi, Yoshihiko

    2010-01-01

    Oxy-combustion generates a high temperature field (above 3000 K), which is applied to next generation power plants and high temperature industrial technologies because of N 2 free processes. However, the combustion temperature is so high that the furnace wall may be fatally damaged. In addition, it is very difficult to control the heat flux and chemical species' concentrations because of rapid chemical reactions. We have developed a new method for controlling the flame by electromagnetic force on this field. In this paper, we experimentally investigated the power coupling between the premixed oxy-combustion with methane and radio frequency (RF) power through the induction coil. By optimizing the power coupling, we observed that the flame can absorb RF power up to 1.5 kW. Spectroscopic measurements also showed an increase in the emission intensity from OH radicals in the flame, indicating improved combustibility. (author)

  2. Theory and experiments on RF plasma heating, current drive and profile control in TORE SUPRA

    International Nuclear Information System (INIS)

    Moreau, D.

    1994-01-01

    This paper reviews the main experimental and theoretical achievements related to the study of RF heating and non-inductive current drive and particularly phenomena related to the current density profile control and the potentiality of producing stationary enhanced performance regimes: description of the Lower Hybrid (LH) and Ion Cyclotron Resonant Frequency (ICRF) systems; long pulse coupling performance of the RF systems; observation of the transition to the so-called ''stationary LHEP regime'' in which the (flat) central current density and (peaked) electron temperature profiles are fully decoupled; experiments on ICRF sawtooth stabilization with the combined effect of LHCD modifying the current density profile; diffusion of fast electrons generated by LH waves; ramp-up experiments in which the LH power provided a significant part of the resistive poloidal flux and flux consumption scaling; theory of spectral wave diffusion and multipass absorption; fast wave current drive modelling with the Alcyon full wave code; a reflector LH antenna concept. 18 figs., 48 refs

  3. Density measurements in the boundary layer of the ASDEX RF heated plasma

    International Nuclear Information System (INIS)

    El Shaer, M.

    1986-11-01

    The boundary layer in the main chamber of ASDEX is diagnosed using a movable 2.2 mm microwave interferometer. The measured radial density profile decreases exponentially outside of the separatrix with three different e-folding lengths, the middle part of the profile is flatter with a larger e-folding length. The boundary density increases proportionally to the increase of the main plasmy density near the separatrix, far from the separatrix this increase is weaker. The boundary density increases with the increase of the main magnetic field in the discharge. With the application of the RF heating at the lower hybrid frequency the boundary density is submitted to a large modification. The behavior of this modification in the density profile depends on the rate of injection of the cold feeding gas. In the discharge with a constant or decreasing gas feeding rate the density profile flattens, and with an increasing rate it steepens when the RF pulse is applied. (orig.)

  4. theoretical and experimental study of plasma acceleration by means of R.F. and static magnetic field gradient

    International Nuclear Information System (INIS)

    Bardet, Rene; Consoli, Terenzio; Geller, Richard

    1964-09-01

    In the first part of the paper, the theory of the physical mechanism of ion dragging by accelerated electrons due to the superimposition of the gradient of a electromagnetic field and the gradient of a static magnetic field, is described. The resulting trajectory of the electrons is a helicoid and one shows the variations of the diameter and the path of the spirals along the axis as a function of the difference between the gyrofrequency and the applied R.F. frequency. The ion acceleration is due to an electron space charge effect. The grouping of the equations of the electronic and ionic fluid motions leads to the introduction of a tensor mass: along the x and y direction the transverse motion of the fluid is controlled by the relativistic mass of electrons whereas along the z direction the axial motion is determined by the ionic mass. Then we deduce physical consequences of the theoretical study and give three experimental evidences. The second part of the paper is devoted to the experimental device called Pleiade which allowed us to verify some of the theoretical predictions. Pleiade produces a D.C. operating plasma beam in which the electrons exhibit radially oriented energies whereas the ionic energy is mainly axial. The experimental results indicate that the energy of the particles is in the keV range. In the third part we deal with the reflecting properties of the device. We show that the R.F. static magnetic field gradients are not only capable of accelerating a Plasma beam along the axially decreasing magnetic field, but are also capable of stopping and reflecting such a beam when the latter is moving along an axially increasing magnetic field. We describe finally a plasma accumulation experiment in which two symmetric structures form simultaneously an accelerator and a 'dynamic mirror' for the particles. Evidence of accumulation is given. (authors) [fr

  5. Plasma assisted combustion : Interaction of a flat flame with a nanosecond dielectric barrier discharge plasma

    NARCIS (Netherlands)

    Elkholy, A.H.E.; van Oijen, J.A.; de Goey, L.P.H.

    2016-01-01

    Using of non-equilibrium Plasma-assisted for ignition, combustion and high speed flow applications are rapidly developing in the last decades due to its ability to produce a large amount of radicals and excited species. Which has a great potential in flame stabilization and emission control.

  6. Energy Considerations for Plasma-Assisted N-Fixation Reactions

    Directory of Open Access Journals (Sweden)

    Aikaterini Anastasopoulou

    2014-09-01

    Full Text Available In a time of increasing concerns about the immense energy consumption and poor environmental performance of contemporary processes in the chemical industry, there is great need to develop novel sustainable technologies that enhance energy efficiency. There is abundant chemical literature on process innovations (laboratory-scale around the plasma reactor itself, which, naturally, is the essential part to be intensified to achieve a satisfactory process. In essence, a plasma process needs attention beyond reaction engineering towards the process integration side and also with strong electrical engineering focus. In this mini-review, we have detailed our future focus on the process and energy intensification of plasma-based N-fixation. Three focal points are mainly stressed throughout the review: (I the integration of renewable energy; (II the power supply system of plasma reactors and (III process design of industrial plasma-assisted nitrogen fixation. These different enabling strategies will be set in a holistic and synergetic picture so as to improve process performance.

  7. Self-consistent calculation of the effects of RF injection in the HHFW heating regimes on the evolution of fast ions in toroidal plasmas

    Directory of Open Access Journals (Sweden)

    Bertelli Nicola

    2017-01-01

    Full Text Available A critical question for the use of ion cyclotron range of frequency (ICRF heating in the ITER device and beyond is interaction of fast waves with energetic ion populations from neutral beam injection (NBI, fusion reactions, and minority ions accelerated by the RF waves themselves. Several experiments have demonstrated that the interaction between fast waves and fast ions can indeed be strong enough to significantly modify the NB ion population. To model the RF/fast ion interaction and the resulting fast ion distribution, a recent extension of the full wave solver TORIC v.5 that includes non-Maxwellian effects has been combined with the Monte Carlo NUBEAM code through an RF “kick” operator. In this work, we present an initial verification of the NUBEAM RF “kick” operator for high harmonic fast wave (HHFW heating regime in NSTX plasma.

  8. Kinetic Study of Nonequilibrium Plasma-Assisted Methane Steam Reforming

    Directory of Open Access Journals (Sweden)

    Hongtao Zheng

    2014-01-01

    Full Text Available To develop a detailed reaction mechanism for plasma-assisted methane steam reforming, a comprehensive numerical and experimental study of effect laws on methane conversion and products yield is performed at different steam to methane molar ratio (S/C, residence time s, and reaction temperatures. A CHEMKIN-PRO software with sensitivity analysis module and path flux analysis module was used for simulations. A set of comparisons show that the developed reaction mechanism can accurately predict methane conversion and the trend of products yield in different operating conditions. Using the developed reaction mechanism in plasma-assisted kinetic model, the reaction path flux analysis was carried out. The result shows that CH3 recombination is the limiting reaction for CO production and O is the critical species for CO production. Adding 40 wt.% Ni/SiO2 in discharge region has significantly promoted the yield of H2, CO, or CO2 in dielectric packed bed (DPB reactor. Plasma catalytic hybrid reforming experiment verifies the reaction path flux analysis tentatively.

  9. Plasma-assisted synthesis of MoS2

    Science.gov (United States)

    Campbell, Philip M.; Perini, Christopher J.; Chiu, Johannes; Gupta, Atul; Ray, Hunter S.; Chen, Hang; Wenzel, Kevin; Snyder, Eric; Wagner, Brent K.; Ready, Jud; Vogel, Eric M.

    2018-03-01

    There has been significant interest in transition metal dichalcogenides (TMDs), including MoS2, in recent years due to their potential application in novel electronic and optical devices. While synthesis methods have been developed for large-area films of MoS2, many of these techniques require synthesis temperatures of 800 °C or higher. As a result of the thermal budget, direct synthesis requiring high temperatures is incompatible with many integrated circuit processes as well as flexible substrates. This work explores several methods of plasma-assisted synthesis of MoS2 as a way to lower the synthesis temperature. The first approach used is conversion of a naturally oxidized molybdenum thin film to MoS2 using H2S plasma. Conversion is demonstrated at temperatures as low as 400 °C, and the conversion is enabled by hydrogen radicals which reduce the oxidized molybdenum films. The second method is a vapor phase reaction incorporating thermally evaporated MoO3 exposed to a direct H2S plasma, similar to chemical vapor deposition (CVD) synthesis of MoS2. Synthesis at 400 °C results in formation of super-stoichiometric MoS2 in a beam-interrupted growth process. A final growth method relies on a cyclical process in which a small amount of Mo is sputtered onto the substrate and is subsequently sulfurized in a H2S plasma. Similar results could be realized using an atomic layer deposition (ALD) process to deposit the Mo film. Compared to high temperature synthesis methods, the lower temperature samples are lower quality, potentially due to poor crystallinity or higher defect density in the films. Temperature-dependent conductivity measurements are consistent with hopping conduction in the plasma-assisted synthetic MoS2, suggesting a high degree of disorder in the low-temperature films. Optimization of the plasma-assisted synthesis process for slower growth rate and better stoichiometry is expected to lead to high quality films at low growth temperature.

  10. Nanoparticle formation in a low pressure argon/aniline RF plasma

    Science.gov (United States)

    Pattyn, C.; Kovacevic, E.; Hussain, S.; Dias, A.; Lecas, T.; Berndt, J.

    2018-01-01

    The formation of nanoparticles in low temperature plasmas is of high importance for different fields: from astrophysics to microelectronics. The plasma based synthesis of nanoparticles is a complex multi-scale process that involves a great variety of different species and comprises timescales ranging from milliseconds to several minutes. This contribution focuses on the synthesis of nanoparticles in a low temperature, low pressure capacitively coupled plasma containing mixtures of argon and aniline. Aniline is commonly used for the production of polyaniline, a material that belongs to the family of conductive polymers, which has attracted increasing interest in the last few years due to the large number of potential applications. The nanoparticles which are formed in the plasma volume and levitate there due to the collection of negative charges are investigated in this contribution by means of in-situ FTIR spectroscopy. In addition, the plasma is analyzed by means of plasma (ion) mass spectroscopy. The experiments reveal the possibility to synthesize nanoparticles both in continuous wave and in pulsed discharges. The formation of particles in the plasma volume can be suppressed by pulsing the plasma in a specific frequency range. The in-situ FTIR analysis also reveals the influence of the argon plasma on the characteristics of the nanoparticles.

  11. Coincident ion acceleration and electron extraction for space propulsion using the self-bias formed on a set of RF biased grids bounding a plasma source

    International Nuclear Information System (INIS)

    Rafalskyi, D; Aanesland, A

    2014-01-01

    We propose an alternative method to accelerate ions in classical gridded ion thrusters and ion sources such that co-extracted electrons from the source may provide beam space charge neutralization. In this way there is no need for an additional electron neutralizer. The method consists of applying RF voltage to a two-grid acceleration system via a blocking capacitor. Due to the unequal effective area of the two grids in contact with the plasma, a dc self-bias is formed, rectifying the applied RF voltage. As a result, ions are continuously accelerated within the grid system while electrons are emitted in brief instants within the RF period when the RF space charge sheath collapses. This paper presents the first experimental results and a proof-of-principle. Experiments are carried out using the Neptune thruster prototype which is a gridded Inductively Coupled Plasma (ICP) source operated at 4 MHz, attached to a larger beam propagation chamber. The RF power supply is used both for the ICP discharge (plasma generation) and powering the acceleration grids via a capacitor for ion acceleration and electron extraction without any dc power supplies. The ion and electron energies, particle flux and densities are measured using retarding field energy analyzers (RFEA), Langmuir probes and a large beam target. The system operates in Argon and N 2 . The dc self-bias is found to be generated within the gridded extraction system in all the range of operating conditions. Broad quasi-neutral ion-electron beams are measured in the downstream chamber with energies up to 400 eV. The beams from the RF acceleration method are compared with classical dc acceleration with an additional external electron neutralizer. It is found that the two acceleration techniques provide similar performance, but the ion energy distribution function from RF acceleration is broader, while the floating potential of the beam is lower than for the dc accelerated beam. (paper)

  12. Role of chlorine in the nanocrystalline silicon film formation by rf plasma-enhanced chemical vapor deposition of chlorinated materials

    International Nuclear Information System (INIS)

    Shirai, Hajime

    2004-01-01

    We demonstrate the disorder-induced low-temperature crystallization in the nanocrystalline silicon film growth by rf plasma-enhanced chemical vapor deposition of H 2 -diluted SiH 2 Cl 2 and SiCl 4 . The combination of the chemical reactivity of SiCld (d: dangling bond) and SiHCl complexes and the release of the disorder-induced stress near the growing surface tightly correlate with the phase transitionity of SiCld and SiHCl complexes near the growing surface with the aid of atomic hydrogen, which induce higher degree of disorder in the a-Si network. These features are most prominent in the SiCl 4 compared with those of SiH 2 Cl 2 and SiH 4 , which preferentially enhance the nanocrystalline Si formation

  13. Formation Of Carbon Oxides In CH4/O2 Plasmas Produced By Inductively Coupled RF Discharges At Low Pressure

    International Nuclear Information System (INIS)

    Moeller, Ivonne; Soltwisch, Henning

    2003-01-01

    The formation of CO and CO2 has been studied in inductively coupled rf (13.56 MHz) discharges with varied mixtures of CH4 and O2 as feed gases at a total pressure of 10 Pa, flow rates of <10 sccm, and input powers of <500 W. The primary diagnostic tool has been TDLAS (tunable diode laser absorption spectroscopy) to measure absolute concentrations of molecular species as well as their kinetic and rovibrational temperatures. Of particular interest is the sudden transition between different modes of power coupling (capacitive and inductive mode, resp.) and the related changes of the plasma composition. We have found that the power threshold for this transition exhibits a clear hysteresis and depends on the oxygen content. Comparing the ratio of the CO- and CO2-concentrations in capacitive mode with corresponding data from a parallel-plate discharge, clear differences have been observed. The findings can partly be explained on the basis of plasma-chemical reaction chains using tabulated cross-sections in combination with estimations of the electron energy distribution function. Some observations (as, e.g. the presence of CO in inductively coupled plasmas that are fed by pure oxygen) cannot be understood from volume reactions only but point to an important role of surface processes, which depend on the materials of the discharge chamber and on its history and cleaning method

  14. Improvement of In-Flight Alumina Spheroidization Process Using a Small Power Argon DC-RF Hybrid Plasma Flow System by Helium Mixture

    Science.gov (United States)

    Takana, Hidemasa; Jang, Juyong; Igawa, Junji; Nakajima, Tomoki; Solonenko, Oleg P.; Nishiyama, Hideya

    2011-03-01

    For the further improvement of in-flight alumina spheroidization process with a low-power direct-current radiofrequency (DC-RF) hybrid plasma flow system, the effect of a small amount of helium gas mixture in argon main gas and also the effect of increasing DC nozzle diameter on powder spheroidization ratio have been experimentally clarified with correlating helium gas mixture percentage, plasma enthalpy, powder in-flight velocity, and temperature. The alumina spheroidization ratio increases by helium gas mixture as a result of enhancement of plasma enthalpy. The highest spheroidization ratio is obtained by 4% mixture of helium in central gas with enlarging nozzle diameter from 3 to 4 mm, even under the constant low input electric power given to a DC-RF hybrid plasma flow system.

  15. Atmospheric pressure plasma-assisted femtosecond laser engraving of aluminium

    Science.gov (United States)

    Gerhard, Christoph; Gimpel, Thomas; Tasche, Daniel; Koch née Hoffmeister, Jennifer; Brückner, Stephan; Flachenecker, Günter; Wieneke, Stephan; Schade, Wolfgang; Viöl, Wolfgang

    2018-05-01

    In this contribution, we report on the impact of direct dielectric barrier discharge argon plasma at atmospheric pressure on femtosecond laser engraving of aluminium. It is shown that the assisting plasma strongly affects the surface geometry and formation of spikes of both laser-engraved single lines and patterns of adjacent lines with an appropriate overlap. Further, it was observed that the overall ablation depth is significantly increased in case of large-scale patterning whereas no notable differences in ablation depth are found for single lines. Several possible mechanisms and underlying effects of this behaviour are suggested. The increase in ablation depth is supposed to be due to a plasma-induced removal of debris particles from the cutting point via charging and oxidation as supported by EDX analysis of the re-solidified debris. Furthermore, the impact of a higher degree of surface wrinkling as well as direct interactions of plasma species with the aluminium surface on the ablation process are discussed.

  16. Measurement of plasma-surface energy fluxes in an argon rf-discharge by means of calorimetric probes and fluorescent microparticles

    International Nuclear Information System (INIS)

    Maurer, H. R.; Kersten, H.; Hannemann, M.; Basner, R.

    2010-01-01

    Measured energy influx densities toward a tungsten dummy substrate in an argon rf-plasma are presented and a model for the description of the energy influx density based on plasma parameters, which have been obtained by Langmuir probe measurements, is applied. Furthermore, temperature measurements of microparticles are presented, which are confined in the plasma sheath. An extension of the model is developed for the description of the energy influx density to the particles. The comparison of model and experimental results offer the possibility to obtain an improved understanding of plasma-surface interactions.

  17. Confinement of Stellarator plasmas with neutral beam and RF heating in W VII-A

    International Nuclear Information System (INIS)

    Grieger, G.; Cattanei, G.; Dorst, D.

    1986-01-01

    WENDELSTEIN VII-A has been operated for ten years. It is a low-shear, high-aspect-ratio device. The confinement properties have been thoroughly studied for both ohmically heated and net-current free plasmas. For the latter case, NBI- and ECF-maintained plasmas were of particular importance. It was found that under optimized conditions the core of high-pressure, net-current free plasmas is mainly governed by collisional effects. The experiment will now be shut down for upgrading it into the Advanced Stellarator WEDNDELSTEIN VII-AS. (author)

  18. Investigation of Plasma Etching for Superconducting RF Cavities Surface Preparation. Final Report

    International Nuclear Information System (INIS)

    Vuskovic, Leposava

    2009-01-01

    Our results show that plasma-treated samples are comparable or superior to a BCP sample, both in the size of features and sharpness of the boundaries between individual features at the surface. Plasma treatment of bulk Nb cavities is a promising technique for microwave cavities preparation used in particle acceleration application. Etching rates are sufficiently high to enable efficient removal of mechanically damaged surface layer with high reproducibility. No impurities are deposited on the bulk Nb surface during plasma treatment. Surface topology characteristic are promising for complex cavity geometry, since discharge conforms the profile of the reaction chamber. In view of these experimental results, we propose plasma treatment for producing microwave cavities with high Q factor instead of using bulk Nb treated with wet etching process.

  19. Sources plasma RF magnétisées : applications à la propulsion spatiale

    OpenAIRE

    Gerst , Jan Dennis

    2013-01-01

    The PEGASES thruster (Plasma Propulsion with Electronegative Gases) is a novel type of electric thruster for space propulsion. It uses negative and positive ions produced by an inductively coupled radio frequency discharge to create the thrust by electrostatically accelerating the ions through a set of grids. A magnetic filter is used to increase the amount of negative ions in the cavity of the thruster. The PEGASES thruster is not only a source to create a strongly negative ion plasma or eve...

  20. Optogalvanic monitoring of collisional transfer of laser excitation energy in a neon RF plasma

    International Nuclear Information System (INIS)

    Armstrong, T.D.

    1994-01-01

    The optogalvanic signals produced by pulsed laser excitation of 1s5--2p8 and 1s5-2p9 (Paschen notation) transition by a ∼29 MHz radiofrequency (rf) discharge at ∼5 torr have been investigated. The optogalvanic signal produced by 1s5-2p9 excitations indicates that there is transfer of energy from the 2p9 state to some other state. The state to which this energy is transferred is believed to be mainly the 2p8 state because of the very small energy gap between the 2p9 and 2p8 states. To verify this transfer, the 1s5-2p8 transition was investigated. The similarity of the temporal profiles of the optogalvanic signals in both excitations confirms the collisional transfer of laser excitation energy from 2p9 to 2p8

  1. Etching of UO2 in NF3 RF Plasma Glow Discharge

    Energy Technology Data Exchange (ETDEWEB)

    Veilleux, John M. [Univ. of California, Berkeley, CA (United States)

    1999-08-01

    A series of room temperature, low pressure (10.8 to 40 Pa), low power (25 to 210 W) RF plasma glow discharge experiments with UO2 were conducted to demonstrate that plasma treatment is a viable method for decontaminating UO2 from stainless steel substrates. Experiments were conducted using NF3 gas to decontaminate depleted uranium dioxide from stainless-steel substrates. Depleted UO2 samples each containing 129.4 Bq were prepared from 100 microliter solutions of uranyl nitrate hexahydrate solution. The amorphous UO2 in the samples had a relatively low density of 4.8 gm/cm3. Counting of the depleted UO2 on the substrate following plasma immersion was performed using liquid scintillation counting with alpha/beta discrimination due to the presence of confounding beta emitting daughter products, 234Th and 234Pa. The alpha emission peak from each sample was integrated using a gaussian and first order polynomial fit to improve quantification. The uncertainties in the experimental measurement of the etched material were estimated at about ± 2%. Results demonstrated that UO2 can be completely removed from stainless-steel substrates after several minutes processing at under 200 W. At 180 W and 32.7 Pa gas pressure, over 99% of all UO2 in the samples was removed in just 17 minutes. The initial etch rate in the experiments ranged from 0.2 to 7.4 μm/min. Etching increased with the plasma absorbed power and feed gas pressure in the range of 10.8 to 40 Pa. A different pressure effect on UO2 etching was also noted below 50 W in which etching increased up to a maximum pressure, ~23 Pa, then decreased with further increases in pressure.

  2. Surface modification of SU-8 for metal/SU-8 adhesion using RF plasma treatment for application in thermopile detectors

    International Nuclear Information System (INIS)

    Ashraf, Shakeel; Mattsson, Claes G; Thungström, Göran; Fondell, Mattis; Lindblad, Andreas

    2015-01-01

    This article reports on plasma treatment of SU-8 epoxy in order to enhance adhesive strength for metals. Its samples were fabricated on standard silicon wafers and treated with (O 2 and Ar) RF plasma at a power of 25 W at a low pressure of (3 × 10 −3 Torr) for different time spans (10–70 s). The sample surfaces were characterized in terms of contact angle, surface (roughness and chemistry) and using a tape test. During the contact angle measurement, it was observed that the contact angle was reduced from 73° to 5° (almost wet) and 23° for (O 2 and Ar) treated samples, respectively. The root mean square surface roughness was significantly increased by 21.5% and 37.2% for (O 2 and Ar) treatment, respectively. A pattern of metal squares was formed on the samples using photolithography for a tape test. An adhesive tape was applied to the samples and peeled off at 180°. The maximum adhesion results, more than 90%, were achieved for the O 2 -treated samples, whereas the Ar-treated samples showed no change. The XPS study shows the formation of new species in the O 2 -treated sample compared to the Ar-treated samples. The high adhesive results were due to the formation of hydrophilic groups and new O 2 species in the O 2 -treated samples, which were absent in Ar-treated samples. (paper)

  3. Plasma treatment of bulk niobium surface for superconducting rf cavities: Optimization of the experimental conditions on flat samples

    Directory of Open Access Journals (Sweden)

    M. Rašković

    2010-11-01

    Full Text Available Accelerator performance, in particular the average accelerating field and the cavity quality factor, depends on the physical and chemical characteristics of the superconducting radio-frequency (SRF cavity surface. Plasma based surface modification provides an excellent opportunity to eliminate nonsuperconductive pollutants in the penetration depth region and to remove the mechanically damaged surface layer, which improves the surface roughness. Here we show that the plasma treatment of bulk niobium (Nb presents an alternative surface preparation method to the commonly used buffered chemical polishing and electropolishing methods. We have optimized the experimental conditions in the microwave glow discharge system and their influence on the Nb removal rate on flat samples. We have achieved an etching rate of 1.7  μm/min⁡ using only 3% chlorine in the reactive mixture. Combining a fast etching step with a moderate one, we have improved the surface roughness without exposing the sample surface to the environment. We intend to apply the optimized experimental conditions to the preparation of single cell cavities, pursuing the improvement of their rf performance.

  4. Study of ultrasound-assisted radio-frequency plasma discharges in n-dodecane

    Science.gov (United States)

    Camerotto, Elisabeth; De Schepper, Peter; Nikiforov, Anton Y.; Brems, Steven; Shamiryan, Denis; Boullart, Werner; Leys, Christophe; De Gendt, Stefan

    2012-10-01

    This paper investigates the generation of a stable plasma phase in a liquid hydrocarbon (n-dodecane) by means of ultrasound (US) and radio-frequency (RF) or electromagnetic radiation. It is demonstrated for the first time that ultrasonic aided RF plasma discharges can be generated in a liquid. Plasma discharges are obtained for different gas mixtures at a pressure of 12 kPa and at low ignition powers (100 W for RF and 2.4 W cm-2 for US). Direct carbon deposition from the liquid precursor on Cu, Ni, SiO2 and Si substrates has been obtained and no apparent compositional or structural difference among the substrate materials was observed. Characterization of the deposited solid phase revealed an amorphous structure. In addition, structural changes in the liquid precursor after plasma treatment have been analysed. Optical emission spectroscopy (OES) allowed the estimation of several plasma characteristic temperatures. The plasma excitation temperature was estimated to be about 2.3-2.4 eV. The rotational and vibrational temperatures of the discharge in n-dodecane with Ar as a feed gas were 1400 K and 6500 K, respectively. In Ar/O2 plasma, an increased rotational (1630 K) and vibrational temperature (7200 K) were obtained.

  5. Copper deposition on fabrics by rf plasma sputtering for medical applications

    International Nuclear Information System (INIS)

    Segura, G; Guzmán, P; Barrantes, Y; Navarro, G; Asenjo, J; Guadamuz, S; Vargas, VI; Zuñiga, P; Chaves, S; Chaves, J

    2015-01-01

    The present work is about preparation and characterization of RF sputtered Cu films on cotton by the usage of a Magnetron Sputter Source and 99.995% purity Cu target at room temperature. Cotton fabric samples of 1, 2 and 4 min of sputtering time at discharge pressure of 1×10 −2 Torr and distance between target and sample of 8 cm were used. The main goal was to qualitatively test the antimicrobial action of copper on fabrics. For that purpose, a reference strain of Escherichia Coli ATCC 35218 that were grown in TSA plates was implemented. Results indicated a decrease in the growth of bacteria by contact with Cu; for fabric samples with longer sputtering presented lower development of E. coli colonies. The scope of this research focused on using these new textiles in health field, for example socks can be made with this textile for the treatment of athlete's foot and the use in pajamas, sheets, pillow covers and robes in hospital setting for reducing the spread of microorganisms. (paper)

  6. Dependence of beam emittance on plasma electrode temperature and rf-power, and filter-field tuning with center-gapped rod-filter magnets in J-PARC rf-driven H− ion source

    International Nuclear Information System (INIS)

    Ueno, A.; Koizumi, I.; Ohkoshi, K.; Ikegami, K.; Takagi, A.; Yamazaki, S.; Oguri, H.

    2014-01-01

    The prototype rf-driven H − ion-source with a nickel plated oxygen-free-copper (OFC) plasma chamber, which satisfies the Japan Proton Accelerator Research Complex (J-PARC) 2nd stage requirements of a H − ion beam current of 60 mA within normalized emittances of 1.5 π mm mrad both horizontally and vertically, a flat top beam duty factor of 1.25% (500 μs × 25 Hz) and a life-time of more than 50 days, was reported at the 3rd international symposium on negative ions, beams, and sources (NIBS2012). The experimental results of the J-PARC ion source with a plasma chamber made of stainless-steel, instead of nickel plated OFC used in the prototype source, are presented in this paper. By comparing these two sources, the following two important results were acquired. One was that the about 20% lower emittance was produced by the rather low plasma electrode (PE) temperature (T PE ) of about 120 °C compared with the typically used T PE of about 200 °C to maximize the beam current for the plasma with the abundant cesium (Cs). The other was that by using the rod-filter magnets with a gap at each center and tuning the gap-lengths, the filter-field was optimized and the rf-power necessary to produce the J-PARC required H − ion beam current was reduced typically 18%. The lower rf-power also decreases the emittances

  7. Laser diagnostics of atomic hydrogen and oxygen production in rf and microwave plasma discharges

    International Nuclear Information System (INIS)

    Preppernau, B.L.

    1993-01-01

    The research for this thesis involved the application of two-photon allowed laser-induced fluorescence (TALIF) to the study of atomic hydrogen and oxygen production in industrial scale radio-frequency and microwave plasma discharge apparatus. Absolute atomic hydrogen concentration profiles were measured in a Gaseous Electronics Conference Reference Cell installed at Wright-Patterson AFB, Ohio operating with a simple H 2 discharge. Two-dimensional atomic hydrogen concentration profiles were also measured in an ASTEX HPMM microwave plasma diamond deposition reactor during actual diamond growth. In addition absolute atomic oxygen concentrations were measured in the ASTEX system. Particular attention as paid to refining the concentration calibration technique and in determining a correction to account for the collisional quenching of excited state fluorescence in high pressure gases

  8. Preparation of boron-rich aluminum boride nanoparticles by RF thermal plasma

    Energy Technology Data Exchange (ETDEWEB)

    Choi, Sooseok [Inha University, Department of Chemical Engineering and Regional Innovation Center for Environmental Technology of Thermal Plasma (Korea, Republic of); Matsuo, Jiro; Cheng, Yingying [Tokyo Institute of Technology, Department of Environmental Chemistry and Engineering (Japan); Watanabe, Takayuki, E-mail: watanabe@chemenv.titech.ac.jp [Kyushu University, Department of Chemical Engineering (Japan)

    2013-08-15

    Boron-rich compounds of AlB{sub 12} and AlB{sub 10} nanoparticles were synthesized by a radiofrequency thermal plasma. Aluminum and boron raw powders were evaporated in virtue of high enthalpy of the thermal plasma in upstream region, followed by the formation of aluminum boride nanoparticles in the tail region of plasma flame with rapid quenching. A high production rate of aluminum boride was confirmed by the X-ray diffraction measurement in the case of high input power, high boron content in raw material and helium inner gas. Polyhedral nanoparticles of 20.8 nm in mean size were observed by a transmission electron microscope. In the raw powder mixture of aluminum, titanium, and boron, titanium-boride nanoparticles were synthesized preferentially, because the Gibbs free energy for the boridation of titanium is lower than that of aluminum. Since the nucleation temperature of boron is higher than that of aluminum, the condensation of metal monomers onto boron nuclei results in the formation of boron-rich aluminum boride nanoparticles.

  9. Optical constants of silicon-like (Si:Ox:Cy:Hz) thin films deposited on quartz using hexamethyldisiloxane in a remote RF hollow cathode discharge plasma

    International Nuclear Information System (INIS)

    Saloum, S.; Naddaf, M.

    2008-01-01

    Deposition of amorphous silicon-like (Si:O x :C y :H z ) thin films in a remote RF hollow cathode discharge plasma using Hexamethyldisoloxane as monomer and Ar as feed gas; has been investigated for films optical constants and plasma diagnostic as a function of RF power (100-300 W) and precursor flow rate (1-10 sccm). Plasma diagnostic has been performed using optical emission spectroscopy (OES). The optical constants (refractive index, extinction coefficient and dielectric constant) have been obtained by reflection/transmission measurements in the range 300-700 nm. It is found that the refractive index increases from 1.92 to 1.97 with increasing power from 100 to 300 W, and from 1.70 to 1.92 with increasing precursor flow rate from 1 to 10 sccm. The optical energy-band gap E g and the optical-absorption tail ΔE have been estimated from optical absorption spectra, it is found that E g decreases from 3.28 eV to 3.14 eV with power increase from 100 to 300 W, and from 3.54 eV to 3.28 eV with precursor flow rate increase from 1 to 10 sccm. ΔE is found to increase with applied RF power and precursor flow rate increase. The dependence of optical constants on deposition parameters has been correlated to plasma OES. (author)

  10. Realization of high efficiency in a plasma-assisted microwave source with two-dimensional electron motion

    International Nuclear Information System (INIS)

    Shkvarunets, A.G.; Carmel, Y.; Nusinovich, G.S.; Abu-elfadl, T.M.; Rodgers, J.; Antonsen, T.M. Jr.; Granatstein, V.; Goebel, D.M.

    2002-01-01

    Conventional microwave sources utilize a strong axial magnetic field to guide an electron beam through an interaction region. A plasma-assisted slow wave microwave oscillator (Pasotron) can operate without an external magnetic field because the presence of ions neutralizes the space charge in the beam, permits the self-pinch forces to provide beam propagation, and allows for the radial motion of electrons under the action of transverse fields of the wave. While the inherent efficiency of conventional microwave sources with 1D electron flow is limited to 15%-20%, it is shown in this work that both the calculated and measured inherent efficiency of devices with 2D electron flow can be higher than 50%. Both in situ diagnostics and analysis confirmed that the enhanced efficiency is due to the fact that rf forces dominate the beam dynamics

  11. On the generation of steady currents in a plasma cylinder using RF waves

    International Nuclear Information System (INIS)

    Hugrass, W.N.

    1980-10-01

    The generation of a steady current in a resistive plasma cylinder by means of a travelling wave magnetic field has been studied using the resistive MHD equations. The nonlinear initial-boundary value problem has been solved using a semi-Lagrangian two dimensional algorithm. The numerical code has been used to simulate the Synchromak experiment of Nagoya University. Hollow d.c. current profiles, similar to the experimental data, have been obtained. A simple analytical argument, of a more general nature, shows that classical resistive diffusion cannot lead to a more uniform current distribution

  12. Some Temperature Effects on AISI-304 Nitriding in an Inductively Coupled RF Plasma

    International Nuclear Information System (INIS)

    Valencia-Alvarado, R.; Barocio, S. R.; Mercado-Cabrera, A.; Pena-Eguiluz, R.; Munoz-Castro, A. E.; Piedad-Beneitez, A. de la; Rosa-Vazquez, J. de la; Lopez-Callejas, R.; Godoy-Cabrera, O. G.

    2006-01-01

    Some recent results obtained from nitriding AISI 304 stainless steel samples, 1.2 cm in diameter and 0.5 cm thick are reported here in the case of an 85% hydrogen and 15% nitrogen mixture work gas. The process was carried out from 300 to 400 W for (13.56 MHz) inductively coupled plasma within a 60 cm long pyrex glass tube 3.5 cm in diameter where the samples were biased up to -300 V with respect to earth. The resulting hardness appears to be a function of the substrate temperature which varied from 200 deg. C at a 0 V bias to 550 deg. C at -300 V. The plasma density at 400 W reached 3x1010 cm-3 with a 4 eV electron temperature. Prior to nitriding, all the samples were polished with 0.05 μm diamond paste, leading to a 30 nm average roughness (Ra). After nitriding at -300 V, the Ra rose until ∼400 nm while hardness values of 1500 HV under 300 g loads were measured. X ray diffraction indicates that the extended phase amplitude (γN), Fe and Cr nitride depends on the substrate temperature

  13. Edge density X-mode reflectometry of RF-heated plasmas on ASDEX

    International Nuclear Information System (INIS)

    Schubert, R.

    1991-09-01

    In the present work microwave reflectometry is extended to the outermost part of tokamak plasmas (n e ≅ 10 11 to 1.5x10 13 cm -3 ), which is subject to strong electron density fluctuations. The perturbations of electron density profile measurements by these fluctuations, which lead to strong modulations in intensity and phase of the reflected signal is analysed in detail. By increasing the frequency of the interference fringes to values between 800 kHz and 2.4 MHz it is possible to make reliable profile measurements even in the region of very strong fluctuations. Measurements in the low density region are only possible with reasonable errors in the X-mode (Eperpendicular toB), as only the cut-off frequency of this mode, in contrast to that of the O-mode (EparallelB), takes a finite value (f ce ) for n e ->O. Taking advantage of this property, a method is presented to calibrate the measurements on the first reflection, which occurs directly in front of the microwave antennas (1-4 mm from the opening) thus giving a high precision even in the outermost part of the plasma close to the microwave antennas. For the calculation of the electron density profile a new and numerically stable algorithm has been developed. Measurements in connection with Lower Hybrid have been made with a set of 2 reflectometer antennas installed in ASDEX. (orig./AH)

  14. Theoretical and experimental studies of a planar inductive coupled rf plasma source as the driver in simulator facility (ISTAPHM) of interactions of waves with the edge plasma on tokamaks

    Science.gov (United States)

    Ghanei, V.; Nasrabadi, M. N.; Chin, O.-H.; Jayapalan, K. K.

    2017-11-01

    This research aims to design and build a planar inductive coupled RF plasma source device which is the driver of the simulator project (ISTAPHM) of the interactions between ICRF Antenna and Plasma on tokamak by using the AMPICP model. For this purpose, a theoretical derivation of the distribution of the RF magnetic field in the plasma-filled reactor chamber is presented. An experimental investigation of the field distributions is described and Langmuir measurements are developed numerically. A comparison of theory and experiment provides an evaluation of plasma parameters in the planar ICP reactor. The objective of this study is to characterize the plasma produced by the source alone. We present the results of the first analysis of the plasma characteristics (plasma density, electron temperature, electron-ion collision frequency, particle fluxes and their velocities, stochastic frequency, skin depth and electron energy distribution functions) as function of the operating parameters (injected power, neutral pressure and magnetic field) as measured with fixed and movable Langmuir probes. The plasma is currently produced only by the planar ICP. The exact goal of these experiments is that the produced plasma by external source can exist as a plasma representative of the edge of tokamaks.

  15. Design of a UHV-compatible rf plasma source and its application to self-assembled layers of CoPt3 nanoparticles

    International Nuclear Information System (INIS)

    Gehl, B.; Leist, U.; Aleksandrovic, V.; Nickut, P.; Zielasek, V.; Weller, H.; Al-Shamery, K.; Baeumer, M.

    2006-01-01

    A compact, versatile, and simple rf plasma source with capacitive coupling compatible to ultrahigh vacuum (UHV) requirements was designed and built to allow sequences of sample surface modification in plasma and surface preparation and analysis in vacuum without breaking the vacuum. The plasma source was operated at working pressures of less than 1 to a few millibars. Sample transfer to UHV was performed at pressures around 10 -9 mbar. For easy integration into an existing UHV setup, the sample recipient and transfer system were made to accept standard commercial sample holders. Preliminary experiments were performed by exposing monolayers of colloidal CoPt 3 nanoparticles to oxygen and hydrogen plasmas. The structural and chemical effects of the plasma treatments were analyzed with scanning electron microscopy and x-ray photoelectron spectroscopy

  16. CIGS thin films, solar cells, and submodules fabricated using a rf-plasma cracked Se-radical beam source

    International Nuclear Information System (INIS)

    Ishizuka, Shogo; Yamada, Akimasa; Shibata, Hajime; Fons, Paul; Niki, Shigeru

    2011-01-01

    Coevaporated Cu(In,Ga)Se 2 (CIGS) film growth using a rf-plasma cracked Se-radical beam (R-Se) source leads to a significant reduction in the amount of raw Se source material wasted during growth and exhibits unique film properties such as highly dense, smooth surfaces and large grain size. R-Se grown CIGS solar cells also show concomitant unique properties different from conventional evaporative Se (E-Se) source grown CIGS cells. In the present work, the impact of modified surfaces, interfaces, and bulk crystal properties of R-Se grown CIGS films on the solar cell performance was studied. When a R-Se source was used, Na diffusion into CIGS layers was enhanced while a remarkable diffusion of elemental Ga and Se into Mo back contact layers was observed. Improvements in the bulk crystal quality as manifested by large grain size and increased Na concentration with the use of a R-Se source is expected to be effective to improve photovoltaic performance. Using a R-Se source for the growth of CIGS absorber layers at a relatively low growth temperature, we have successfully demonstrated a monolithically integrated submodule efficiency of 15.0% (17 cells, aperture area of 76.5 cm 2 ) on 0.25-mm thick soda-lime glass substrates.

  17. Comparative investigation of novel hetero gate dielectric and drain engineered charge plasma TFET for improved DC and RF performance

    Science.gov (United States)

    Yadav, Dharmendra Singh; Verma, Abhishek; Sharma, Dheeraj; Tirkey, Sukeshni; Raad, Bhagwan Ram

    2017-11-01

    Tunnel-field-effect-transistor (TFET) has emerged as one of the most prominent devices to replace conventional MOSFET due to its ability to provide sub-threshold slope below 60 mV/decade (SS ≤ 60 mV/decade) and low leakage current. Despite this, TFETs suffer from ambipolar behavior, lower ON-state current, and poor RF performance. To address these issues, we have introduced drain and gate work function engineering with hetero gate dielectric for the first time in charge plasma based doping-less TFET (DL TFET). In this, the usage of dual work functionality over the drain region significantly reduces the ambipolar behavior of the device by varying the energy barrier at drain/channel interface. Whereas, the presence of dual work function at the gate terminal increases the ON-state current (ION). The combined effect of dual work function at the gate and drain electrode results in the increment of ON-state current (ION) and decrement of ambipolar conduction (Iambi) respectively. Furthermore, the incorporation of hetero gate dielectric along with dual work functionality at the drain and gate electrode provides an overall improvement in the performance of the device in terms of reduction in ambipolarity, threshold voltage and sub-threshold slope along with improved ON-state current and high frequency figures of merit.

  18. Study of effect of grain size on dust charging in an RF plasma using three-dimensional PIC-MCC simulations

    International Nuclear Information System (INIS)

    Ikkurthi, V. R.; Melzer, A.; Matyash, K.; Schneider, R.

    2008-01-01

    A 3-dimensional Particle-Particle Particle-Mesh (P 3 M) code is applied to study the charging process of micrometer size dust grains confined in a capacitive RF discharge. In our model, particles (electrons and ions) are treated kinetically (Particle-in-Cell with Monte Carlo Collisions (PIC-MCC)). In order to accurately resolve the plasma particles' motion close to the dust grain, the PIC technique is supplemented with Molecular Dynamics (MD), employing an an analytic electrostatic potential for the interaction with the dust grain. This allows to self-consistently resolve the dust grain charging due to absorption of plasma electrons and ions. The charging of dust grains confined above lower electrode in a capacitive RF discharge and its dependence on the size and position of the dust is investigated. The results have been compared with laboratory measurements

  19. Characterization of Carbon-Contaminated B4C-Coated Optics after Chemically Selective Cleaning with Low-Pressure RF Plasma.

    Science.gov (United States)

    Moreno Fernández, H; Rogler, D; Sauthier, G; Thomasset, M; Dietsch, R; Carlino, V; Pellegrin, E

    2018-01-22

    Boron carbide (B 4 C) is one of the few materials that is expected to be most resilient with respect to the extremely high brilliance of the photon beam generated by free electron lasers (FELs) and is thus of considerable interest for optical applications in this field. However, as in the case of many other optics operated at light source facilities, B 4 C-coated optics are subject to ubiquitous carbon contaminations. Carbon contaminations represent a serious issue for the operation of FEL beamlines due to severe reduction of photon flux, beam coherence, creation of destructive interference, and scattering losses. A variety of B 4 C cleaning technologies were developed at different laboratories with varying success. We present a study regarding the low-pressure RF plasma cleaning of carbon contaminated B 4 C test samples via inductively coupled O 2 /Ar, H 2 /Ar, and pure O 2 RF plasma produced following previous studies using the same ibss GV10x downstream plasma source. Results regarding the chemistry, morphology as well as other aspects of the B 4 C optical coating before and after the plasma cleaning are reported. We conclude that among the above plasma processes only plasma based on pure O 2 feedstock gas exhibits the required chemical selectivity for maintaining the integrity of the B 4 C optical coatings.

  20. Examining the Potential of Plasma-Assisted Pretreated Wheat Straw for Enzyme Production by Trichoderma reesei

    DEFF Research Database (Denmark)

    Rodríguez Gómez, Divanery; Lehmann, Linda Olkjær; Schultz-Jensen, Nadja

    2012-01-01

    Plasma-assisted pretreated wheat straw was investigated for cellulase and xylanase production by Trichoderma reesei fermentation. Fermentations were conducted with media containing washed and unwashed plasma-assisted pretreated wheat straw as carbon source which was sterilized by autoclavation....... To account for any effects of autoclavation, a comparison was made with unsterilized media containing antibiotics. It was found that unsterilized washed plasma-assisted pretreated wheat straw (which contained antibiotics) was best suited for the production of xylanases (110 IU ml(-1)) and cellulases (0...... other nonrefined feedstocks suggests that plasma pretreated wheat straw is a promising and suitable substrate for cellulase and hemicellulase production....

  1. The gridless plasma ion source (GIS) for plasma ion assisted optical coating

    International Nuclear Information System (INIS)

    You Dawei; Li Xiaoqian; Wang Yu; Lin Yongchang

    2004-01-01

    High-quality optical coating is a key technology for modern optics. Ion-assisted deposition technology was used to improve the vaporized coating in 1980's. The GIS (gridless ion source), which is an advanced plasma source for producing a high-quality optical coating in large area, can produce a large area uniformity>1000 mm (diameter), a high ion current density ∼0.5 mA/cm 2 , 20 eV-200 eV energetic plasma ions and can activate reactive gas and film atoms. Now we have developed a GIS system. The GIS and the plasma ion-assisted deposition technology are investigated to achieve a high-quality optical coating. The GIS is a high power and high current source with a power of 1 kW-7.5 kW, a current of 10 A- 70 A and an ion density of 200 μA/cm 2 -500 μA/cm 2 . Because of the special magnetic structure, the plasma-ion extraction efficiency has been improved to obtain a maximum ion density of 500 μA/cm 2 in the medium power (∼4 kW) level. The GIS applied is of a special cathode structure, so that the GIS operation can be maintained under a rather low power and the lifetime of cathode will be extended. The GIS has been installed in the LPSX-1200 type box coating system. The coated TiO 2 , SiO 2 films such as antireflective films with the system have the same performance reported by Leybold Co, 1992, along with a controllable refractive index and film structure. (authors)

  2. Mass synthesis of yttrium oxide nano-powders using radio frequency (RF) plasma

    International Nuclear Information System (INIS)

    Ghorui, S.; Sahasrabudhe, S.N.; Chakravarthy, Y.; Nagaraj, A.; Das, A.K.; Dhamale, G.

    2014-01-01

    Mass synthesis of nano-phase Yttrium Oxide (Y 2 O 3 ) from commercially available coarse grain powder is reported. Nano-sized high purity Y 2 O 3 is an important and critical constituent of ceramics like YAG (Yttrium aluminum garnet: Y 3 Al 5 O 12 ) for laser applications. The system is characterized in terms of its thermal and electrical behavior. Boltzmann plot technique is used to measure axial variation of temperature of the generated plasma. The synthesized particles are characterized in terms of XRD, SEM, TEM and BET analyses for qualification of the developed system. Major features observed are efficient conversion into nanometer-sized highly spherical particles, narrow size distribution, highly crystallite nature and highly pure phases. The particle distribution (from TEM) peaks within 20-30 nm. Average particle sizes determined from different methods like XRD, TEM and BET are very close to each other and point toward particle sizes within 20 to 30 nm

  3. TiO2 thin and thick films grown on Si/glass by sputtering of titanium targets in an RF inductively coupled plasma

    International Nuclear Information System (INIS)

    Valencia-Alvarado, R; López-Callejas, R; Mercado-Cabrera, A; Peña-Eguiluz, R; Muñoz-Castro, A E; Rodríguez-Méndez, B G; De la Piedad-Beneitez, A; De la Rosa-Vázquez, J M

    2015-01-01

    TiO 2 thin and thick films were deposited on silicon/glass substrates using RF inductive plasma in continuous wave. The films thickness, as well as phases control, is achieved with a gradual increase in temperature substrates varying supplied RF power or working gas pressure besides deposition time as well. The deposition conditions were: argon 80%/oxygen 20% carefully calibrated mixture of 2 to 7×10 −2 mbar as working gas pressure range. Deposition time 0.5 to 5 hours, 500 or 600 W RF power at 13.56 MHz frequency and 242-345 °C substrates temperature range. The titanium dioxide deposited on the substrates is grown by sputtering of a titanium target negatively polarized at 3-5 kV DC situated 14 mm in front of such substrates. The plasma reactor is a simple Pyrex-like glass cylindrical vessel of 50 cm long and 20 cm in diameter. Using the before describe plasma parameters we obtained films only anatase and both anatase/rutile phases with stoichiometric different. The films were characterized by X-ray photoelectron spectroscopy (XPS), stylus profilometer, X-ray diffraction (XRD), scanning electron microscopy (SEM) and Raman spectroscopy. (paper)

  4. Electron cyclotron resonance heating assisted plasma startup in the Tore Supra tokamak

    International Nuclear Information System (INIS)

    Bucalossi, J.; Hertout, P.; Lennholm, M.; Saint-Laurent, F.; Bouquey, F.; Darbos, C.; Traisnel, E.

    2009-04-01

    ECRH assisted plasma startup at fundamental resonance is investigated in Tore Supra in view of ITER operation. ECRH pre-ionisation is found to be very efficient allowing plasma initiation in a wide range of pre-fill pressure compared to ohmic startup. Reliable assisted startup has been achieved at the ITER reference toroidal electric field (0.3 V/m) with 160 kW of ECRH. Resonance location scan indicates that the plasma is initiated at the resonance location and that the plasma current channel position had to be real-time controlled since the very beginning of the discharge to obtain robust plasma startup. (authors)

  5. Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage

    International Nuclear Information System (INIS)

    Dvorak, P; Vasina, P; Bursikova, V; Zemlicka, R

    2010-01-01

    Fourier components of discharge voltages were measured in two different reactive plasmas and their response to the creation or destruction of a thin film was studied. In reactive magnetron sputtering the effect of transition from the metallic to the compound mode accompanied by the creation of a compound film on the sputtered target was observed. Further, deposition and etching of a diamond-like carbon film and their effects on amplitudes of Fourier components of the discharge voltage were studied. It was shown that the Fourier components, including higher harmonic frequencies, sensitively react to the presence of a film. Therefore, they can be used as a powerful tool for the monitoring of deposition and etching processes. It was demonstrated that the behaviour of the Fourier components was caused in both experiments by the presence of the film. It was not caused by changes in the chemical composition of the gas phase induced by material etched from the film or decrease in gettering rate. Further, the observed behaviour was not affected by the film conductivity. The behaviour of the Fourier components can be explained by the difference between the coefficients of secondary electron emission of the film and its underlying material.

  6. High temperature electrons exhausted from rf plasma sources along a magnetic nozzle

    Science.gov (United States)

    Takahashi, Kazunori; Akahoshi, Hikaru; Charles, Christine; Boswell, Rod W.; Ando, Akira

    2017-08-01

    Two dimensional profiles of electron temperature are measured inside and downstream of a radiofrequency plasma thruster source having a magnetic nozzle and being immersed in vacuum. The temperature is estimated from the slope of the fully swept I-V characteristics of a Langmuir probe acquired at each spatial position and with the assumption of a Maxwellian distribution. The results show that the peripheral high temperature electrons in the magnetic nozzle originate from the upstream antenna location and are transported along the "connecting" magnetic field lines. Two-dimensional measurements of electron energy probability functions are also carried out in a second simplified laboratory device consisting of the source contiguously connected to the diffusion chamber: again the high temperature electrons are detected along the magnetic field lines intersecting the wall at the antenna location, even when the antenna location is shifted along the main axis. These results demonstrate that the peripheral energetic electrons in the magnetic nozzle mirror those created in the source tube.

  7. Characterization of In-Flight Processing of Alumina Powder Using a DC-RF Hybrid Plasma Flow System at Constant Low Operating Power

    Science.gov (United States)

    Nishiyama, H.; Onodera, M.; Igawa, J.; Nakajima, T.

    2009-12-01

    The aim of this study is to provide the optimum operating conditions for enhancing in-flight alumina particle heating as much as possible for particle spheroidization and aggregation of melted particles using a DC-RF hybrid plasma flow system even at constant low operating power based on the thermofluid considerations. It is clarified that the swirl flow and higher operating pressure enhance the particle melting and aggregation of melted particles coupled with increasing gas temperature downstream of a plasma uniformly in the radial direction at constant electrical discharge conditions.

  8. Heteroepitaxial Growth of Germanium-on-Silicon Using Ultrahigh-Vacuum Chemical Vapor Deposition with RF Plasma Enhancement

    Science.gov (United States)

    Alharthi, Bader; Grant, Joshua M.; Dou, Wei; Grant, Perry C.; Mosleh, Aboozar; Du, Wei; Mortazavi, Mansour; Li, Baohua; Naseem, Hameed; Yu, Shui-Qing

    2018-05-01

    Germanium (Ge) films have been grown on silicon (Si) substrate by ultrahigh-vacuum chemical vapor deposition with plasma enhancement (PE). Argon plasma was generated using high-power radiofrequency (50 W) to assist in germane decomposition at low temperature. The growth temperature was varied in the low range of 250°C to 450°C to make this growth process compatible with complementary metal-oxide-semiconductor technology. The material and optical properties of the grown Ge films were investigated. The material quality was determined by Raman and x-ray diffraction techniques, revealing growth of crystalline films in the temperature range of 350°C to 450°C. Photoluminescence spectra revealed improved optical quality at growth temperatures of 400°C and 450°C. Furthermore, material quality study using transmission electron microscopy revealed existence of defects in the Ge layer grown at 400°C. Based on the etch pit density, the average threading dislocation density in the Ge layer obtained at this growth temperature was measured to be 4.5 × 108 cm-2. This result was achieved without any material improvement steps such as use of graded buffer or thermal annealing. Comparison between PE and non-plasma-enhanced growth, in the same machine at otherwise the same growth conditions, indicated increased growth rate and improved material and optical qualities for PE growth.

  9. Plasma Assisted Ignition and Combustion at Low Initial Gas Temperatures: Development of Kinetic Mechanism

    Science.gov (United States)

    2016-10-05

    R and Pouvesle J M 2009 Experimental study of a compact nanosecond plasma gun Plasma Processes and Polymers 6 795—802 [11] Heinlin J, Morfill G...radially symmetrical geometry. The thickness of the plasma layer in the direction perpendicular to the dielectric plane is about 1 mm. The central coaxial ...Positive and negative polarity discharge at elevated pres- sures Discharge in coaxial geometry has been developed for plasma assisted ignition at high

  10. Study of the electron energy distribution function in plasma produced by a rf discharge in a mixture of inert gases

    International Nuclear Information System (INIS)

    Vagner, S.D.; Ignat'ev, B.K.

    1983-01-01

    Electron energy distribution functions (EEDF) are recorded in an rf discharge in a mixture of neon and argon. The rates of different ionization processes and the energy losses of the electrons in the bulk of the discharge are calculated. The experimentally recorded electron energy distribution functions are compared with distributions calculated using a nonlocal theory. The effect of an rf voltage in the probe circuit on the recorded electron energy distribution functions is investigated experimentally

  11. Inactivation of Gram-Negative Bacteria by Low-Pressure RF Remote Plasma Excited in N2-O2 Mixture and SF6 Gases

    Directory of Open Access Journals (Sweden)

    Ayman Al-Mariri

    2013-12-01

    Full Text Available The role of low-pressure RF plasma in the inactivation of Escherichia coli O157, Klebsiella pneumoniae, Proteus mirabilis, and Enterobacter sakazakii using N2-O2 and SF6 gases was assessed. 1×109 colony-forming units (CFUs of each bacterial isolate were placed on three polymer foils. The effects of pressure, power, distance from the source, and exposure time to plasma gases were optimized. The best conditions to inactivate the four bacteria were a 91%N2-9%O2 mixture and a 30-minute exposure time. SF6 gas was more efficient for all the tested isolates in as much as the treatment time was reduced to only three minutes. Therefore, low-pressure plasma could be used to sterilize heat and/or moisture-sensitive medical instruments.

  12. Measurement of heavy metals by means of a plasma-assisted method

    International Nuclear Information System (INIS)

    Hernberg, R.; Haeyrinen, V.; Oikari, R.

    1995-01-01

    The plasma-assisted measuring device for on-line measurement of alkali metal concentrations in pressurised processes, which has been developed in the Laboratory, will be further developed to provide for simultaneous measurement of heavy metal concentrations. (author)

  13. Annealing of hydrogen-induced defects in RF-plasma-treated Si wafers: ex situ and in situ transmission electron microscopy studies

    International Nuclear Information System (INIS)

    Ghica, C; Nistor, L C; Vizireanu, S; Dinescu, G

    2011-01-01

    The smart-cut(TM) process is based on inducing and processing structural defects below the free surface of semiconductor wafers. The necessary defects are currently induced by implantation of light elements such as hydrogen or helium. An alternative softer way to induce shallow subsurface defects is by RF-plasma hydrogenation. To facilitate the smart-cut process, the wafers containing the induced defects need to be subjected to an appropriate thermal treatment. In our experiments, (0 0 1) Si wafers are submitted to 200 and 50 W hydrogen RF-plasma and are subsequently annealed. The samples are studied by transmission electron microscopy (TEM), before and after annealing. The plasma-introduced defects are {1 1 1} and {1 0 0} planar-like defects and nanocavities, all of them involving hydrogen. Many nanocavities are aligned into strings almost parallel to the wafer surface. The annealing is performed either by furnace thermal treatment at 550 deg. C, or by in situ heating in the electron microscope at 450, 650 and 800 deg. C during the TEM observations. The TEM microstructural studies indicate a partial healing of the planar defects and a size increase of the nanometric cavities by a coalescence process of the small neighbouring nanocavities. By annealing, the lined up nanometric voids forming chains in the as-hydrogenated sample coalesced into well-defined cracks, mostly parallel to the wafer surface.

  14. Liquid assisted plasma enhanced chemical vapour deposition with a non-thermal plasma jet at atmospheric pressure

    Czech Academy of Sciences Publication Activity Database

    Schäfer, J.; Fricke, K.; Mika, Filip; Pokorná, Zuzana; Zajíčková, L.; Foest, R.

    2017-01-01

    Roč. 630, MAY 30 (2017), s. 71-78 ISSN 0040-6090 R&D Projects: GA MŠk(CZ) LO1212; GA MŠk ED0017/01/01 Institutional support: RVO:68081731 Keywords : plasma jet * liquid assisted plasma enhanced chemical * vapour deposition * silicon oxide Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering OBOR OECD: Coating and films Impact factor: 1.879, year: 2016

  15. Large-aperture plasma-assisted deposition of inertial confinement fusion laser coatings.

    Science.gov (United States)

    Oliver, James B; Kupinski, Pete; Rigatti, Amy L; Schmid, Ansgar W; Lambropoulos, John C; Papernov, Semyon; Kozlov, Alexei; Spaulding, John; Sadowski, Daniel; Chrzan, Z Roman; Hand, Robert D; Gibson, Desmond R; Brinkley, Ian; Placido, Frank

    2011-03-20

    Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of large-aperture, high-fluence coatings used in vacuum for substrates 1m in aperture.

  16. Improvement in the Sensitivity of PbO Doped Tin Oxide Thick Film Gas Sensor by RF and Microwave Oxygen Plasma Treatment

    Directory of Open Access Journals (Sweden)

    J. K. SRIVASTAVA

    2010-07-01

    Full Text Available In the present work efforts have been made to analyze the effect of oxygen plasma and PbO doping on the sensitivity of SnO2-based thick film gas sensor for methanol, propanol and acetone. The effect of substrate temperature on the response of dual frequency (RF and microwave plasma treated thick film sensor array has also been studied. To achieve this, three sensor arrays (each with four tin oxide sensors doped with different (1 %, 2 %, 3 % and 4 % PbO concentrations were fabricated by thick film technology and then treated with oxygen plasma for various durations (5 min, 10 min. and 15 min.. The plasma treated sensors were found to possess appreciably high sensitivity at room temperature in comparison to untreated sensor. The sensitivity showed the increasing trend with plasma exposure time and 15 minutes exposure time was found to be most suitable as the sensitivity of the plasma treated sensors for this duration were high towards all the chosen vapors with maximum (97 % value for propanol. The sensitivity of the sensors were found to be increasing gradually as PbO concentration was varied from 1- 4%.

  17. Development of the DC-RF Hybrid Plasma Source and the Application to the Etching and Texturing of the Silicon Surface

    International Nuclear Information System (INIS)

    Kim, Ji Hun

    2011-02-01

    the vacuum chamber for vacuum processing. The experiment was provided on the mono-crystalline silicon wafer. The etching was carried out with plasma consisting of SF 6 (50 sccm) as a reactive etching gas with O 2 (300 sccm) as a supporting gas and Argon (2000 ∼ 3000 sccm) as a cathode protecting gas. Etching rates were 60 μm/min at low pressure (3-5 torr) and 300 μm/min at a atmospheric pressure. The sample was positioned in such as way that the plasma flow axis would coincide with the side facet of the silicon crystal. A texturing process was performed on a crystalline silicon (c-Si) wafer to increase the efficiency of a solar cell by using a high durability DC arc plasma source at atmospheric pressure and low pressure. CF 4 and SF 6 were used as the reactive etching gases at flow rates 2 as the supporting gas in the range of the 5 - 15 %. To survey the characteristics of the pyramid formation process, plasma texturing experiments were performed by varying the working time. The optimal operating conditions of the gas flow (Ar, O 2 , CF 4 , SF 6 ), plasmatron current and processing time were determined. The pyramid angle was approximately 50 .deg. to 60 .deg. when a single-crystalline silicon surface was textured in a vacuum whereas it was approximately 75 .deg. to 90 .deg. when textured at atmospheric pressure. The reflectance decreases with decreasing pyramid angle. The reflectance of the bare silicon ranged from 40 % to the 60 % but that of the textured silicon was approximately 5 % to 20 %. This reflectance is quite low, approximately half that reported by other studies using wet and reactive ion etching (RIE) texturing. Even though DC arc plasmatron has many advantages, it is difficult to apply an industry due to the small applied area. To increase an effective processing area, we suggest a DC-RF hybrid plasma system. The DC-RF hybrid plasma system was designed and made. This system consists of a DC arc plasmatron, RF parts, reaction chamber, power feeder

  18. Experimental study of a RF plasma source with helicon configuration in the mix Ar/H_2. Application to the chemical etching of carbon materials surfaces in the framework of the plasma-wall interactions studies of ITER's divertor

    International Nuclear Information System (INIS)

    Bieber, T.

    2012-01-01

    The issue of the interaction wall-plasma is important in thermonuclear devices. The purpose of this work is to design a very low pressure atomic plasma source in order to study chemical etching of carbon surfaces in the same conditions as edge plasma in tokamaks. The experimental work has consisted in 2 stages: first, the characterisation of the new helicon configuration reactor developed for this research and secondly the atomic hydrogen source used for the chemical etching. The first chapter recalls what thermonuclear fusion is. The helicon configuration reactor as well as its diagnostics (optical emission spectroscopy, laser induced fluorescence - LIF, and Langmuir probe) are described in the second chapter. The third chapter deals with the different coupling modes (RF power and plasma) identified in pure argon plasmas and how they are obtained by setting experimental parameters such as injected RF power, magnetic fields or pressure. The fourth chapter is dedicated to the study of the difference in behavior between the electronic density and the relative density of metastable Ar"+ ions. The last chapter presents the results in terms of mass losses of the carbon material surfaces obtained with the atomic hydrogen source. (A.C.)

  19. Production of low-density plasma by coaxially segmented rf discharge for void-free dusty cloud in microgravity experiments

    International Nuclear Information System (INIS)

    Suzukawa, Wataru; Ikada, Reijiro; Tanaka, Yasuhiro; Iizuka, Satoru

    2006-01-01

    A technique is presented for producing a low density plasma by introducing a coaxially segmented parallel-plate radio-frequency discharge for void-free dusty-cloud formation. Main plasma for the dusty plasma experiment is produced in a central core part of the parallel-plate discharge, while a plasma for igniting the core plasma discharge is produced in the periphery region surrounding the core plasma. The core plasma density can be markedly decreased to reduce the ion drag force, which is important for a formation of void-free dusty cloud under microgravity

  20. RF transport

    International Nuclear Information System (INIS)

    Choroba, Stefan

    2013-01-01

    This paper deals with the techniques of transport of high-power radiofrequency (RF) power from a RF power source to the cavities of an accelerator. Since the theory of electromagnetic waves in waveguides and of waveguide components is very well explained in a number of excellent text books it will limit itself on special waveguide distributions and on a number of, although not complete list of, special problems which sometimes occur in RF power transportation systems. (author)

  1. Demonstration of Plasma Assisted Waste Conversion to Gas

    Data.gov (United States)

    National Aeronautics and Space Administration — The goal is to demonstrate high fidelity mission waste simulant conversion with a proprietary DC plasma torch, a different approach from industry which uses higher...

  2. RF plasma deposition of thin Si{sub x}Ge{sub y}C{sub z}:H films using a combination of organometallic source materials

    Energy Technology Data Exchange (ETDEWEB)

    Rapiejko, C. [Institute for Materials Science and Engineering, Technical University of LodzLz Stefanowskiego 1, 90-924 Lodz (Poland); Gazicki-Lipman, M. [Institute for Materials Science and Engineering, Technical University of LodzLz Stefanowskiego 1, 90-924 Lodz (Poland)]. E-mail: gazickim@p.lodz.pl; Klimek, L. [Institute for Materials Science and Engineering, Technical University of LodzLz Stefanowskiego 1, 90-924 Lodz (Poland); Szymanowski, H. [Institute for Materials Science and Engineering, Technical University of LodzLz Stefanowskiego 1, 90-924 Lodz (Poland); Strojek, M. [Institute for Materials Science and Engineering, Technical University of LodzLz Stefanowskiego 1, 90-924 Lodz (Poland)

    2004-12-22

    Elements of the IV group of periodic table have been strongly present in the fast development of PECVD techniques for the last two decades at least. As a result, deposition technologies of such materials as a-Si:H, a-C:H, m{mu}-C:H or DLC have been successfully established. What has followed is an ever growing interest in binary systems of the A{sub x}(IV)B{sub y}(IV):H kind. One possible way to deposit such systems is to use organosilicon compounds (to deposit Si{sub x}C{sub y}:H films) or organogermanium compounds (to deposit Ge{sub x}C{sub y}:H films), as source substances. The present paper reports on a RF plasma deposition of a Si{sub x}Ge{sub y}C{sub z}:H ternary system, using a combination of organosilicon and organogermanium compounds. Thin Si/Ge/C films have been fabricated in a small volume (ca. 2 dm{sup 3}) parallel plate RF plasma reactor using, as a source material, a combination of tetramethylsilane (TMS) and tetramethylgermanium (TMG) vapours carried by argon. SEM investigations reveal a continuous compact character of the coatings and their uniform thickness. The elemental composition of the films has been studied using EDX analysis. The results of the analysis show that the elemental composition of the films can be controlled by both the TMG/TMS ratio of the initial mixture and the RF power input. Ellipsometric measurements show good homogeneity of these materials. Chemical bonding in the films has been studied using the FTIR technique. Bandgap calculations have been carried out using ellipsometric data and by applying both the Tauc law and the Moss approach.

  3. Synthesis and characterization of Al2O3 and SiO2 films with fluoropolymer content using rf-plasma magnetron sputtering technique

    International Nuclear Information System (INIS)

    Islam, Mohammad; Inal, Osman T.

    2008-01-01

    Pure and molecularly mixed inorganic films for protection against atomic oxygen in lower earth orbit were prepared using radio-frequency (rf) plasma magnetron sputtering technique. Alumina (Al 2 O 3 ) and silica (SiO 2 ) films with average grain size in the range of 30-80 nm and fully dense or dense columnar structure were synthesized under different conditions of pressure and power. Simultaneous oxide sputtering and plasma polymerization (PP) of hexafluoropropylene (HFP) led to the formation of molecularly mixed films with fluoropolymer content. The degree of plasma polymerization was strongly influenced by total chamber pressure and the argon to HFP molar ratio (n Ar /n M ). An order of magnitude increase in pressure due to argon during codeposition changed the plasma-polymerization mechanism from radical-chain- to radical-radical-type processes. Subsequently, a shift from linear CH 2 group based chain polymerization to highly disordered fluoropolymer content with branching and cross-linking was observed. Fourier transform infrared spectroscopy studies revealed chemical interaction between depositing SiO 2 and PP-HFP through appearance of absorption bands characteristic of Si-F stretching and expansion of SiO 2 network. The relative amount and composition of plasma-polymerized fluoropolymer in such films can be controlled by changing argon to HFP flow ratio, total chamber pressure, and applied power. These films offer great potential for use as protective coatings in aerospace applications

  4. Effect of surface microstructure and wettability on plasma protein adsorption to ZnO thin films prepared at different RF powers

    Energy Technology Data Exchange (ETDEWEB)

    Huang Zhanyun; Chen Min; Chen Dihu [State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-Sen University, Guangzhou 510275 (China); Pan Shirong, E-mail: stscdh@mail.sysu.edu.c [Artificial Heart Lab, the 1st Affiliate Hospital of Sun Yat-Sen University, Guangzhou 510080 (China)

    2010-10-01

    In this paper, the adsorption behavior of plasma proteins on the surface of ZnO thin films prepared by radio frequency (RF) sputtering under different sputtering powers was studied. The microstructures and surface properties of the ZnO thin films were investigated by x-ray diffraction (XRD), scanning electron microscopy (SEM), UV-visible optical absorption spectroscopy and contact angle techniques. The results show that the ZnO thin films have better orientation of the (0 0 2) peak with increasing RF power, especially at around 160 W, and the optical band gap of the ZnO films varies from 3.2 to 3.4 eV. The contact angle test carried out by the sessile drop technique denoted a hydrophobic surface of the ZnO films, and the surface energy and adhesive work of the ZnO thin films decreased with increasing sputtering power. The amounts of human fibrinogen (HFG) and human serum albumin (HSA) adsorbing on the ZnO films and reference samples were determined by using enzyme-linked immunosorbent assay (ELISA). The results show that fewer plasma proteins and a smaller HFG/HSA ratio adsorb on the ZnO thin films' surface.

  5. RF MEMS

    Indian Academy of Sciences (India)

    At the bare die level the insertion loss, return loss and the isolation ... ing and packaging of a silicon on glass based RF MEMS switch fabricated using DRIE. ..... follows the power law based on the asperity deformation model given by Pattona & ... Surface mount style RF packages (SMX series 580465) from Startedge Corp.

  6. rf coupler technology for fusion applications

    International Nuclear Information System (INIS)

    Hoffman, D.J.

    1983-01-01

    Radio frequency (rf) oscillations at critical frequencies have successfully provided a means to convey power to fusion plasmas due to the electrical-magnetic properties of the plasma. While large rf systems to couple power to the plasma have been designed, built, and tested, the main link to the plasma, the coupler, is still in an evolutionary stage of development. Design and fabrication of optimal antennas for fusion applications are complicated by incomplete characterizations of the harsh plasma environment and of coupling mechanisms. A brief description of rf coupler technology required for plasma conditions is presented along with an assessment of the status and goals of coupler development

  7. Towards large-scale plasma-assisted synthesis of nanowires

    Science.gov (United States)

    Cvelbar, U.

    2011-05-01

    Large quantities of nanomaterials, e.g. nanowires (NWs), are needed to overcome the high market price of nanomaterials and make nanotechnology widely available for general public use and applications to numerous devices. Therefore, there is an enormous need for new methods or routes for synthesis of those nanostructures. Here plasma technologies for synthesis of NWs, nanotubes, nanoparticles or other nanostructures might play a key role in the near future. This paper presents a three-dimensional problem of large-scale synthesis connected with the time, quantity and quality of nanostructures. Herein, four different plasma methods for NW synthesis are presented in contrast to other methods, e.g. thermal processes, chemical vapour deposition or wet chemical processes. The pros and cons are discussed in detail for the case of two metal oxides: iron oxide and zinc oxide NWs, which are important for many applications.

  8. Emission characteristics of kerosene-air spray combustion with plasma assistance

    Directory of Open Access Journals (Sweden)

    Xingjian Liu

    2015-09-01

    Full Text Available A plasma assisted combustion system for combustion of kerosene-air mixtures was developed to study emission levels of O2, CO2, CO, and NOx. The emission measurement was conducted by Testo 350-Pro Flue Gas Analyzer. The effect of duty ratio, feedstock gas flow rate and applied voltage on emission performance has been analyzed. The results show that O2 and CO emissions reduce with an increase of applied voltage, while CO2 and NOx emissions increase. Besides, when duty ratio or feedstock gas flow rate decreases, the same emission results would appear. The emission spectrum of the air plasma of plasma assisted combustion actuator was also registered to analyze the kinetic enhancement effect of plasma, and the generation of ozone was believed to be the main factor that plasma makes a difference in our experiment. These results are valuable for the future optimization of kerosene-fueled aircraft engine when using plasma assisted combustion devices to exert emission control.

  9. Numerical study of plasma generation process and internal antenna heat loadings in J-PARC RF negative ion source

    Energy Technology Data Exchange (ETDEWEB)

    Shibata, T., E-mail: shibat@post.j-parc.jp; Ueno, A.; Oguri, H.; Ohkoshi, K.; Ikegami, K.; Takagi, A.; Asano, H.; Naito, F. [J-PARC Center, Tokai-mura, Naka-gun, Ibaraki-ken 319-1195 (Japan); Nishida, K.; Mochizuki, S.; Hatayama, A. [Keio University, Hiyoshi, Kohoku-ku, Yokohama-shi, Kanagawa-ken 223-8522 (Japan); Mattei, S.; Lettry, J. [European Organization for Nuclear Research (CERN), 1211 Geneva 23 (Switzerland)

    2016-02-15

    A numerical model of plasma transport and electromagnetic field in the J-PARC (Japan Proton Accelerator Research Complex) radio frequency ion source has been developed to understand the relation between antenna coil heat loadings and plasma production/transport processes. From the calculation, the local plasma density increase is observed in the region close to the antenna coil. Electrons are magnetized by the magnetic field line with absolute magnetic flux density 30–120 Gauss which leads to high local ionization rate. The results suggest that modification of magnetic configuration can be made to reduce plasma heat flux onto the antenna.

  10. A new design approach for enhancement of DC/RF characteristics with improved ambipolar conduction of charge plasma TFET: proposal, and optimization

    Science.gov (United States)

    Aslam, Mohd.; Sharma, Dheeraj; Yadav, Shivendra; Soni, Deepak; Bajaj, Varun

    2018-04-01

    This article presents a new device structure to suppress ambipolarity with enhanced electrostatic characteristics of charge plasma TFET (CP-TFET). Here, implantation of a metal angle (MA) of low workfunction inside the high-k dielectric (HfO2) layer near source/channel interface gives excellent improvement in DC and RF characteristics of the proposed device. Deposition of MA is advantageous to increase abruptness of source/channel junction for reducing the tunneling barrier. Along with MA placement, the metal electrode, which is placed over the silicon wafer for inducing N+ drain region, is divided into the two parts of low and high workfunctions. The workfunction of the part of metal electrode near the channel region is taken comparatively higher than the other part to restrict the tunneling of holes at drain/channel junction under negative bias (-V_gs) condition. Such concept induces asymmetrical concentration of charge carriers in the drain region, which widens the tunneling barrier at the drain/channel interface. Consequently, the proposed device shows better RF performance along with suppressed ambipolar conduction. Furthermore, reliability of conventional and proposed structures has been tested in terms of linearity. Simultaneously, the effect of workfunction and length variation of MA on the device characteristics is analyzed in optimization section of the article.

  11. Influence of operating parameters on surface properties of RF glow discharge oxygen plasma treated TiO{sub 2}/PET film for biomedical application

    Energy Technology Data Exchange (ETDEWEB)

    Pandiyaraj, K. Navaneetha, E-mail: dr.knpr@gmail.com [Surface Engineering Laboratory, Department of Physics, Sri Shakthi Institute of Engineering and Technology, L and T by pass, Chinniyam Palayam (post), Coimbatore 641062 (India); Deshmukh, R.R. [Department of Physics, Institute of Chemical Technology, Matunga, Mumbai 400 019 (India); Mahendiran, R. [Surface Engineering Laboratory, Department of Physics, Sri Shakthi Institute of Engineering and Technology, L and T by pass, Chinniyam Palayam (post), Coimbatore 641062 (India); Su, Pi-G [Department of Chemistry, Chinese Culture University, Taipei 111, Taiwan (China); Yassitepe, Emre; Shah, Ismat [Department of Physics and Astronomy, Department of Materials Science and Engineering, University of Delaware, 208 Dupont Hall, Newark (United States); Perni, Stefano [School of Pharmacy and Pharmaceutical Sciences, Cardiff University, Cardiff (United Kingdom); Prokopovich, Polina [School of Pharmacy and Pharmaceutical Sciences, Cardiff University, Cardiff (United Kingdom); Institute of Medical Engineering and Medical Physics, School of Engineering, Cardiff University (United Kingdom); Nadagouda, Mallikarjuna N., E-mail: Nadagouda.Mallikarjuna@epamail.epa.gov [The U.S. Environmental Protection Agency, ORD, NRMRL, WSWRD, 26W. Martin Luther King Drive, Cincinnati, OH 45268 (United States)

    2014-03-01

    In this paper, a thin transparent titania (TiO{sub 2}) film was coated on the surface of flexible poly(ethylene terephthalate) (PET) film using the sol–gel method. The surface properties of the obtained TiO{sub 2}/PET film were further improved by RF glow discharge oxygen plasma as a function of exposure time and discharge power. The changes in hydrophilicity of TiO{sub 2}/PET films were analyzed by contact angle measurements and surface energy. The influence of plasma on the surface of the TiO{sub 2}/PET films was analyzed by atomic force microscopy (AFM) as well as the change in chemical state and composition that were investigated by X-ray photo electron spectroscopy (XPS). The cytotoxicity of the TiO{sub 2}/PET films was analyzed using human osteoblast cells and the bacterial eradication behaviors of TiO{sub 2}/PET films were also evaluated against Staphylococcus bacteria. It was found that the surface roughness and incorporation of oxygen containing polar functional groups of the plasma treated TiO{sub 2}/PET films increased substantially as compared to the untreated one. Moreover the increased concentration of Ti{sup 3+} on the surface of plasma treated TiO{sub 2}/PET films was due to the transformation of chemical states (Ti{sup 4+} → Ti{sup 3+}). These morphological and chemical changes are responsible for enhanced hydrophilicity of the TiO{sub 2}/PET films. Furthermore, the plasma treated TiO{sub 2}/PET film exhibited no citotoxicity against osteoblast cells and antibacterial activity against Staphylococcus bacteria which can find application in manufacturing of biomedical devices. - Graphical abstract: Mechanism of plasma treatment on the surface of TiO{sub 2}/PET films. - Highlights: • Investigated the surface properties of TiO{sub 2}/PET films modified by O{sub 2} plasma • Studied the effect of operating parameters on surface properties of TiO{sub 2}/PET films • Mechanism of the plasma treatment on TiO{sub 2}/PET was clearly investigated.

  12. Tunable molten oxide pool assisted plasma-melter vitrification systems

    Science.gov (United States)

    Titus, Charles H.; Cohn, Daniel R.; Surma, Jeffrey E.

    1998-01-01

    The present invention provides tunable waste conversion systems and apparatus which have the advantage of highly robust operation and which provide complete or substantially complete conversion of a wide range of waste streams into useful gas and a stable, nonleachable solid product at a single location with greatly reduced air pollution to meet air quality standards. The systems provide the capability for highly efficient conversion of waste into high quality combustible gas and for high efficiency conversion of the gas into electricity by utilizing a high efficiency gas turbine or an internal combustion engine. The solid product can be suitable for various commercial applications. Alternatively, the solid product stream, which is a safe, stable material, may be disposed of without special considerations as hazardous material. In the preferred embodiment, the arc plasma furnace and joule heated melter are formed as a fully integrated unit with a common melt pool having circuit arrangements for the simultaneous independently controllable operation of both the arc plasma and the joule heated portions of the unit without interference with one another. The preferred configuration of this embodiment of the invention utilizes two arc plasma electrodes with an elongated chamber for the molten pool such that the molten pool is capable of providing conducting paths between electrodes. The apparatus may additionally be employed with reduced use or without further use of the gases generated by the conversion process. The apparatus may be employed as a net energy or net electricity producing unit where use of an auxiliary fuel provides the required level of electricity production. Methods and apparatus for converting metals, non-glass forming waste streams and low-ash producing inorganics into a useful gas are also provided. The methods and apparatus for such conversion include the use of a molten oxide pool having predetermined electrical, thermal and physical

  13. Kinetics in Gas Mixtures for Problem of Plasma Assisted Combustion

    Science.gov (United States)

    2010-05-01

    precautions: in the case of relatively low elec- tron density, as it is realized for N2 or for O2, non–zero background due to accumulation of residual electron...and Lave L B 2003 Evaluating automobile fuel/propulsion system technologies Progress in Energy and Combustion Science 29 (2003) 1--69 [11] Polak L S...43 79—110 [41] Janev R K and Reiter D 2004 Collision processes of C2,3Hy and C2,3H + y hydrocarbons with electrons and protons Phys. Plasmas 11 780—829

  14. Plasma-Assisted Chemistry in High-Speed Flow

    International Nuclear Information System (INIS)

    Leonov, Sergey B.; Yarantsev, Dmitry A.; Napartovich, Anatoly P.; Kochetov, Igor V.

    2007-01-01

    Fundamental problems related to the high-speed combustion are analyzed. The result of plasma-chemical modeling is presented as a motivation of experimental activity. Numerical simulations of the effect of uniform non-equilibrium discharge on the premixed hydrogen and ethylene-air mixture in supersonic flow demonstrate an advantage of such a technique over a heating. Experimental results on multi-electrode non-uniform discharge maintenance behind wallstep and in cavity of supersonic flow are presented. The model test on hydrogen and ethylene ignition is demonstrated at direct fuel injection to low-temperature high-speed airflow

  15. Multiplying probe for accurate power measurements on an RF driven atmospheric pressure plasma jet applied to the COST reference microplasma jet

    International Nuclear Information System (INIS)

    Beijer, P A C; Sobota, A; Van Veldhuizen, E M; Kroesen, G M W

    2016-01-01

    In this paper a new multiplying probe for measuring the power dissipated in a miniature capacitively coupled, RF driven, atmospheric pressure plasma jet (μAPPJ—COST Reference Microplasma Jet—COST RMJ) is presented. The approach aims for substantially higher accuracy than provided by traditionally applied methods using bi-directional power meters or commercially available voltage and current probes in conjunction with digitizing oscilloscopes. The probe is placed on a miniature PCB and designed to minimize losses, influence of unknown elements, crosstalk and variations in temperature. The probe is designed to measure powers of the order of magnitude of 0.1–10 W. It is estimated that it measures power with less than 2% deviation from the real value in the tested power range. The design was applied to measure power dissipated in COST-RMJ running in helium with a small addition of oxygen. (paper)

  16. Simultaneous in situ measurements of properties of particulates in rf silane plasmas using a polarization-sensitive laser-light-scattering method

    Science.gov (United States)

    Shiratani, Masaharu; Kawasaki, Hiroharu; Fukuzawa, Tsuyoshi; Yoshioka, Takashi; Ueda, Yoshio; Singh, Sanjay; Watanabe, Yukio

    1996-01-01

    A polarization-sensitive laser-light-scattering method is developed for simultaneous in situ measurements of properties (size, size dispersion, density, and refractive index) of particulates formed in processing plasmas. The developed system is applied to observe the growth processes of particulates in a range of their size larger than about 10 nm in rf silane plasmas. A size, a size dispersion (logarithm of a standard deviation of size), a density, and a refractive index of particulates in the plasmas are found to be 10-200 nm, about 0.1, 107-109 cm-3 and about 3-5i, respectively. The former three of such values agree fairly well with ones deduced from scanning electron microscopic (SEM) observation. These particulates grow through three phases of nucleation and initial growth, rapid growth, and growth saturation. Coexistence of two size groups of particulates with narrow size dispersions during and after the rapid growth phase verified by the SEM observation may be explained by a model taking into account coagulation between oppositely charged particulates.

  17. Spatially resolved ozone densities and gas temperatures in a time modulated RF driven atmospheric pressure plasma jet: an analysis of the production and destruction mechanisms

    International Nuclear Information System (INIS)

    Zhang Shiqiang; Van Gessel, Bram; Hofmann, Sven; Van Veldhuizen, Eddie; Bruggeman, Peter; Van Gaens, Wouter; Bogaerts, Annemie

    2013-01-01

    In this work, a time modulated RF driven DBD-like atmospheric pressure plasma jet in Ar + 2%O 2 , operating at a time averaged power of 6.5 W is investigated. Spatially resolved ozone densities and gas temperatures are obtained by UV absorption and Rayleigh scattering, respectively. Significant gas heating in the core of the plasma up to 700 K is found and at the position of this increased gas temperature a depletion of the ozone density is found. The production and destruction reactions of O 3 in the jet effluent as a function of the distance from the nozzle are obtained from a zero-dimensional chemical kinetics model in plug flow mode which considers relevant air chemistry due to air entrainment in the jet fluent. A comparison of the measurements and the models show that the depletion of O 3 in the core of the plasma is mainly caused by an enhanced destruction of O 3 due to a large atomic oxygen density. (paper)

  18. Growth of a New Ternary BON Crystal on Si(100) by Plasma-Assisted MOCVD and Study on the Effects of Fed Gas and Growth Temperature

    Science.gov (United States)

    Chen, G. C.; Lee, S.-B.; Boo, J.-H.

    A new ternary BOxNy crystal was grown on Si(100) substrate at 500°C by low-frequency (100 kHz) radio-frequency (rf) derived plasma-assisted MOCVD with an organoborate precursor. The as-grown deposits were characterized by SEM, TED, XPS, XRD, AFM and FT-IR. The experimental results showed that BOxNy crystal was apt to be formed at N-rich atmosphere and high temperature. The decrease of hydrogen flux in fed gases was of benefit to form BON crystal structure. The crystal structure of BOxNy was as similar to that of H3BO3 in this study.

  19. Investigation of the physical properties of ion assisted ZrN thin films deposited by RF magnetron sputtering

    International Nuclear Information System (INIS)

    Signore, M A; Valerini, D; Rizzo, A; Tapfer, L; Capodieci, L; Cappello, A

    2010-01-01

    Ion bombardment during thin film growth is known to cause structural and morphological changes in the deposited films, thus affecting their physical properties. In this work zirconium nitride films have been deposited by the ion assisted magnetron sputtering technique. The ion energy is controlled by varying the voltage applied to the substrate in the range 0-25 V. The deposited ZrN films are characterized for their structure, surface roughness, oxygen contamination, optical reflectance and electrical resistivity. With increasing substrate voltage crystallinity of the films is enhanced with a preferential orientation of the ZrN grains having the (1 1 1) axis perpendicular to the substrate surface. At the same time, a decrease in electrical resistivity and oxygen contamination content is observed up to 20 V. A higher substrate voltage (25 V) causes an inversion in the observed experimental trends. The role of oxygen contamination decrease and generation of nitrogen vacancies due to ionic assistance have been considered as a possible explanation for the experimental results.

  20. Investigation of the physical properties of ion assisted ZrN thin films deposited by RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Signore, M A; Valerini, D; Rizzo, A; Tapfer, L; Capodieci, L; Cappello, A [ENEA, Department of Physical Technologies and New Materials, SS7, Appia, km 706, 72100 Brindisi (Italy)

    2010-06-09

    Ion bombardment during thin film growth is known to cause structural and morphological changes in the deposited films, thus affecting their physical properties. In this work zirconium nitride films have been deposited by the ion assisted magnetron sputtering technique. The ion energy is controlled by varying the voltage applied to the substrate in the range 0-25 V. The deposited ZrN films are characterized for their structure, surface roughness, oxygen contamination, optical reflectance and electrical resistivity. With increasing substrate voltage crystallinity of the films is enhanced with a preferential orientation of the ZrN grains having the (1 1 1) axis perpendicular to the substrate surface. At the same time, a decrease in electrical resistivity and oxygen contamination content is observed up to 20 V. A higher substrate voltage (25 V) causes an inversion in the observed experimental trends. The role of oxygen contamination decrease and generation of nitrogen vacancies due to ionic assistance have been considered as a possible explanation for the experimental results.

  1. Plasma-assisted heterogeneous catalysis for NOx reduction in lean-burn engine exhaust

    Energy Technology Data Exchange (ETDEWEB)

    Penetrante, B.M.; Hsaio, M.C.; Merritt, B.T.; Vogtlin, G.E. [Lawrence Livermore National Lab., CA (United States); Wan, C.Z.; Rice, G.W.; Voss, K.E. [Engelhard Corp., Iselin, NJ (United States)

    1997-12-31

    This paper discusses the combination of a plasma with a catalyst to improve the reduction of NO{sub x} under lean-burn conditions. The authors have been investigating the effects of a plasma on the NO{sub x} reduction activity and temperature operating window of various catalytic materials. One of the goals is to develop a fundamental understanding of the interaction between the gas-phase plasma chemistry and the heterogeneous chemistry on the catalyst surface. The authors have observed that plasma assisted heterogeneous catalysis can facilitate NO{sub x} reduction under conditions that normally make it difficult for either the plasma or the catalyst to function by itself. By systematically varying the plasma electrode and catalyst configuration, they have been able to elucidate the process by which the plasma chemistry affects the chemical reduction of NO{sub x} on the catalyst surface. They have discovered that the main effect of the plasma is to induce the gas-phase oxidation of NO to NO{sub 21}. The reduction of NO{sub x} to N{sub 2} is then accomplished by heterogeneous reaction of O with activated hydrocarbons on the catalyst surface. The use of a plasma opens the opportunity for a new class of catalysts that are potentially more durable, more active, more selective and more sulfur-tolerant compared to conventional lean-NO{sub x} catalysts.

  2. Plasma-Assisted Synthesis of NiCoP for Efficient Overall Water Splitting

    KAUST Repository

    Liang, Hanfeng; Gandi, Appala; Anjum, Dalaver H.; Wang, Xianbin; Schwingenschlö gl, Udo; Alshareef, Husam N.

    2016-01-01

    be further enhanced by substitution with extrinsic metals, though very little work has been conducted in this area. Here we present for the first time a novel PH plasma-assisted approach to convert NiCo hydroxides into ternary NiCoP. The obtained Ni

  3. Kinetic mechanism of plasma-assisted ignition of hydrocarbons

    International Nuclear Information System (INIS)

    Kosarev, I N; Aleksandrov, N L; Kindysheva, S V; Starikovskaia, S M; Starikovskii, A Yu

    2008-01-01

    Ignition of hydrocarbon-containing gaseous mixtures has been studied experimentally and numerically under the action of a high-voltage nanosecond discharge at elevated temperatures. Ignition delay times were measured behind a reflected shock wave in stoichiometric C n H 2n+2 : O 2 mixtures (10%) diluted with Ar (90%) for n = 1-5. It was shown that the application of the gas discharge leads to more than an order of magnitude decrease in ignition delay time for all hydrocarbons under consideration. The measured values of ignition delay time agree well with the results of a numerical simulation of the ignition based on the calculation of atom and radical production during the discharge and in its afterglow. The analysis of simulation results showed that a non-equilibrium plasma favours the ignition mainly due to O atoms produced in the active phase of the discharge. (fast track communication)

  4. Hybrid simulation of electron energy distributions and plasma characteristics in pulsed RF CCP sustained in Ar and SiH4/Ar discharges

    Science.gov (United States)

    Wang, Xi-Feng; Jia, Wen-Zhu; Song, Yuan-Hong; Zhang, Ying-Ying; Dai, Zhong-Ling; Wang, You-Nian

    2017-11-01

    Pulsed-discharge plasmas offer great advantages in deposition of silicon-based films due to the fact that they can suppress cluster agglomeration, moderate the energy of bombarding ions, and prolong the species' diffusion time on the substrate. In this work, a one-dimensional fluid/Monte-Carlo hybrid model is applied to study pulse modulated radio-frequency (RF) plasmas sustained in capacitively coupled Ar and SiH4/Ar discharges. First, the electron energy distributions in pulsed Ar and SiH4/Ar plasmas have been investigated and compared under identical discharge-circuit conditions. The electron energy distribution function (EEDF) in Ar discharge exhibits a familiar bi-Maxwellian shape during the power-on phase of the pulse, while a more complex (resembling a multi-Maxwellian) distribution with extra inflection points at lower energies is observed in the case of the SiH4/Ar mixture. These features become more prominent with the increasing fraction of SiH4 in the gas mixture. The difference in the shape of the EEDF (which is pronounced inside the plasma but not in the RF sheath where electron heating occurs) is mainly attributed to the electron-impact excitations of SiH4. During the power-off phase of the pulse, the EEDFs in both Ar and SiH4/Ar discharges evolve into bi-Maxwellian shapes, with shrinking high energy tails. Furthermore, the parameter of ion species in the case of SiH4/Ar discharge is strongly modulated by pulsing. For positive ions, such as SiH3+ and Si2H4+ , the particle fluxes overshoot at the beginning of the power-on interval. Meanwhile, for negative ions such as SiH2- and SiH3- , density profiles observed between the electrodes are saddle-shaped due to the repulsion by the self-bias electric field as it builds up. During the power-off phase, the wall fluxes of SiH2- and SiH3- gradually increase, leading to a significant decrease in the net surface charge density on the driven electrode. Compared with ions, the density of SiH3 is poorly modulated

  5. Plasma-assisted ignition and combustion: nanosecond discharges and development of kinetic mechanisms

    Science.gov (United States)

    Starikovskaia, S. M.

    2014-09-01

    This review covers the results obtained in the period 2006-2014 in the field of plasma-assisted combustion, and in particular the results on ignition and combustion triggered or sustained by pulsed nanosecond discharges in different geometries. Some benefits of pulsed high voltage discharges for kinetic study and for applications are demonstrated. The necessity of and the possibility of building a particular kinetic mechanism of plasma-assisted ignition and combustion are discussed. The most sensitive regions of parameters for plasma-combustion kinetic mechanisms are selected. A map of the pressure and temperature parameters (P-T diagram) is suggested, to unify the available data on ignition delay times, ignition lengths and densities of intermediate species reported by different authors.

  6. Investigations on the pyrolysis of hydrocarbons in the inductive coupled RF-plasma and the deposited pyrocarbon

    International Nuclear Information System (INIS)

    Eisgruber, H.; Mazurkiewicz, M.; Nickel, H.

    1979-08-01

    The pyrocarbon coatings of the nuclear fuel particles for the High-Temperature Reactor (HTR) are produced by pyrolysis of hydrocarbons under high temperatures. The investigations of the inductive coupled argon or argon/hydrocarbon-plasma performed in the frame of this work deliver a contribution for the clarification of pyrolysis processes and the production of pyrolytic carbons in the plasma of an electric discharge. The argon-plasma, as high-temperature source, is diagnosed theoretically and emission-spectroscopically. To the pure argon-plasma the various hydrocarbons are added. Due to the thermal decomposition the carbon is separated in solid form. The structure of the deposited pyrocarbon is composed of different components. The depositions are characterised with the principles in use at the IRW and are assigned to the fluidized bed pyrocarbons as fas as possible. (orig.) [de

  7. Diagnostics of microwave assisted electron cyclotron resonance plasma source for surface modification of nylon 6

    Science.gov (United States)

    More, Supriya E.; Das, Partha Sarathi; Bansode, Avinash; Dhamale, Gayatri; Ghorui, S.; Bhoraskar, S. V.; Sahasrabudhe, S. N.; Mathe, Vikas L.

    2018-01-01

    Looking at the increasing scope of plasma processing of materials surface, here we present the development and diagnostics of a microwave assisted Electron Cyclotron Resonance (ECR) plasma system suitable for surface modification of polymers. Prior to the surface-treatment, a detailed diagnostic mapping of the plasma parameters throughout the reactor chamber was carried out by using single and double Langmuir probe measurements in Ar plasma. Conventional analysis of I-V curves as well as the elucidation form of the Electron Energy Distribution Function (EEDF) has become the source of calibration of plasma parameters in the reaction chamber. The high energy tail in the EEDF of electron temperature is seen to extend beyond 60 eV, at much larger distances from the ECR zone. This proves the suitability of the rector for plasma processing, since the electron energy is much beyond the threshold energy of bond breaking in most of the polymers. Nylon 6 is used as a representative candidate for surface processing in the presence of Ar, H2 + N2, and O2 plasma, treated at different locations inside the plasma chamber. In a typical case, the work of adhesion is seen to almost get doubled when treated with oxygen plasma. Morphology of the plasma treated surface and its hydrophilicity are discussed in view of the variation in electron density and electron temperature at these locations. Nano-protrusions arising from plasma treatment are set to be responsible for the hydrophobicity. Chemical sputtering and physical sputtering are seen to influence the surface morphology on account of sufficient electron energies and increased plasma potential.

  8. Membrane-based, sedimentation-assisted plasma separator for point-of-care applications.

    Science.gov (United States)

    Liu, Changchun; Mauk, Michael; Gross, Robert; Bushman, Frederic D; Edelstein, Paul H; Collman, Ronald G; Bau, Haim H

    2013-11-05

    Often, high-sensitivity, point-of-care (POC) clinical tests, such as HIV viral load, require large volumes of plasma. Although centrifuges are ubiquitously used in clinical laboratories to separate plasma from whole blood, centrifugation is generally inappropriate for on-site testing. Suitable alternatives are not readily available to separate the relatively large volumes of plasma from milliliters of blood that may be needed to meet stringent limit-of-detection specifications for low-abundance target molecules. We report on a simple-to-use, low-cost, pump-free, membrane-based, sedimentation-assisted plasma separator capable of separating a relatively large volume of plasma from undiluted whole blood within minutes. This plasma separator consists of an asymmetric, porous, polysulfone membrane housed in a disposable chamber. The separation process takes advantage of both gravitational sedimentation of blood cells and size exclusion-based filtration. The plasma separator demonstrated a "blood in-plasma out" capability, consistently extracting 275 ± 33.5 μL of plasma from 1.8 mL of undiluted whole blood within less than 7 min. The device was used to separate plasma laden with HIV viruses from HIV virus-spiked whole blood with recovery efficiencies of 95.5% ± 3.5%, 88.0% ± 9.5%, and 81.5% ± 12.1% for viral loads of 35,000, 3500, and 350 copies/mL, respectively. The separation process is self-terminating to prevent excessive hemolysis. The HIV-laden plasma was then injected into our custom-made microfluidic chip for nucleic acid testing and was successfully subjected to reverse-transcriptase loop-mediated isothermal amplification (RT-LAMP), demonstrating that the plasma is sufficiently pure to support high-efficiency nucleic acid amplification.

  9. Evaluation of oxygen species during E-H transition in inductively coupled RF plasmas: combination of experimental results with global model

    Science.gov (United States)

    Meichsner, Jürgen; Wegner, Thomas

    2018-05-01

    Inductively coupled RF plasmas (ICP) in oxygen at low pressure have been intensively studied as a molecular and electronegative model system in the last funding period of the Collaborative Research Centre 24 "Fundamentals of Complex Plasmas". The ICP configuration consists of a planar coil inside a quartz cylinder as dielectric barrier which is immersed in a large stainless steel vacuum chamber. In particular, the E-H mode transition has been investigated, combining experimental results from comprehensive plasma diagnostics as input for analytical rate equation calculation of a volume averaged global model. The averaged density was determined for electrons, negative ions O-, molecular oxygen ground state O2(X3 Σg-) and singlet metastable state O2(a1 Δg) from line-integrated measurements using 160 GHz Gaussian beam microwave interferometry coupled with laser photodetachment experiment and VUV absorption spectroscopy, respectively. Taking into account the relevant elementary processes and rate coefficients from literature together with the measured temperatures and averaged density of electrons, O2(X3 Σg-) and O2(a1 Δg) the steady state density was calculated for O(3P), O2(b1 Σg+), O(1D), O(1S), O3, O-, O2-, and O3-, respectively. The averaged density of negative ions O- from the rate equation calculation is compared with the measured one. The normalized source and loss rates are discussed for O(3P), O2(b1 Σg+) and O-. Contribution to the Topical Issue "Fundamentals of Complex Plasmas", edited by Jürgen Meichsner, Michael Bonitz, Holger Fehske, Alexander Piel.

  10. Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition

    International Nuclear Information System (INIS)

    Tinck, S; Bogaerts, A

    2011-01-01

    In this paper, an O 2 inductively coupled plasma used for plasma enhanced atomic layer deposition of Al 2 O 3 thin films is investigated by means of modeling. This work intends to provide more information about basic plasma properties such as species densities and species fluxes to the substrate as a function of power and pressure, which might be hard to measure experimentally. For this purpose, a hybrid model developed by Kushner et al is applied to calculate the plasma characteristics in the reactor volume for different chamber pressures ranging from 1 to 10 mTorr and different coil powers ranging from 50 to 500 W. Density profiles of the various oxygen containing plasma species are reported as well as fluxes to the substrate under various operating conditions. Furthermore, different orientations of the substrate, which can be placed vertically or horizontally in the reactor, are taken into account. In addition, special attention is paid to the recombination process of atomic oxygen on the different reactor walls under the stated operating conditions. From this work it can be concluded that the plasma properties change significantly in different locations of the reactor. The plasma density near the cylindrical coil is high, while it is almost negligible in the neighborhood of the substrate. Ion and excited species fluxes to the substrate are found to be very low and negligible. Finally, the orientation of the substrate has a minor effect on the flux of O 2 , while it has a significant effect on the flux of O. In the horizontal configuration, the flux of atomic oxygen can be up to one order of magnitude lower than in the vertical configuration.

  11. Effect of the ponderomotive force in interaction of an amplitude modulated rf-field with a nonuniform plasma

    Energy Technology Data Exchange (ETDEWEB)

    Hoegger, B A; Schneider, H; Vaucher, B G [Fribourg Univ. (Switzerland). Inst. de Physique

    1982-06-30

    Magnetoacoustic oscillations are excited in an inhomogeneous magnetized plasma cylinder by amplitude modulation of a high frequency field (2.45 GHz, 3 kW PEP). The antenna is a long helical slow-wave structure. The axial field-oscillating with the modulation frequency (2/15 MHz) is monitored by means of electrostatically shielded magnetic probes. Resonance behaviour is observed around the eigenfrequency of the plasma cylinder. Power absorption is measured with diamagnetic loop technique. The plasma parameters are: mean electron density 3x10/sup 12/ cm/sup -3/, electron temperature 3.5 eV, magnetic field 1.6 kG, filling gas 7x10/sup -4/ Torr argon.

  12. SiOx Ink-Repellent Layer Deposited by Radio Frequency (RF) Plasmas in Continuous Wave and Pulse Mode

    International Nuclear Information System (INIS)

    Chen Qiang; Fu Yabo; Pang Hua; Zhang Yuefei; Zhang Guangqiu

    2007-01-01

    Low surface energy layers, proposed application for non-water printing in computer to plate (CTP) technology, are deposited in both continuous wave and pulse radio frequency (13.56 MHz) plasma with hexamethyldisiloxane (HMDSO) as precursor. It is found that the plasma mode dominates the polymer growth rate and the surface composition. Derived from the spectra of X-ray photoelectron spectroscopy (XPS) and combined with printable test it is concluded that concentration of Si in coatings plays an important role for the ink printability and the ink does not adhere on the surface with high silicon concentration

  13. Reconstruction of the time-averaged sheath potential profile in an argon RF plasma using the ion energy distribution

    International Nuclear Information System (INIS)

    Fivaz, M.; Brunner, S.; Schwarzenbach, W.; Howling, A.A.; Hollenstein, C.

    1994-10-01

    Charge-exchange collisions and radio-frequency excitation combine to give peaks in the ion energy distribution measured at the ground electrode of an argon plasma in a capacitive reactor. These peaks are used as a diagnostic to reconstruct the profile of the time-averaged potential in the sheath. Particle-In-Cell simulations show that the method is accurate. The method is applied to investigate the sheath thickness as a function of excitation frequency at constant plasma power. The time-averaged potential is found to be parabolic in both experimental measurements and numerical simulation. (author) 6 figs., 1 tab., 15 refs

  14. Composite SiOx/hydrocarbon plasma polymer films prepared by RF magnetron sputtering of SiO2 and polyimide

    Czech Academy of Sciences Publication Activity Database

    Drabik, M.; Kousal, J.; Pinosh, Y.; Choukourov, A.; Biederman, H.; Slavínská, D.; Macková, Anna; Boldyryeva, Hanna; Pešička, J.

    2007-01-01

    Roč. 81, č. 7 (2007), s. 920-927 ISSN 0042-207X Institutional research plan: CEZ:AV0Z10480505 Keywords : composite films * magnetron * sputtering * polyimide * SiO2 Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 0.881, year: 2007

  15. Nanoparticle manipulation in the near-substrate areas of low-temperature, high-density rf plasmas

    International Nuclear Information System (INIS)

    Rutkevych, P.P.; Ostrikov, K.; Xu, S.

    2005-01-01

    Manipulation of a single nanoparticle in the near-substrate areas of high-density plasmas of low-temperature glow discharges is studied. It is shown that the nanoparticles can be efficiently manipulated by the thermophoretic force controlled by external heating of the substrate stage. Particle deposition onto or repulsion from nanostructured carbon surfaces critically depends on the values of the neutral gas temperature gradient in the near-substrate areas, which is directly measured in situ in different heating regimes by originally developed temperature gradient probe. The measured values of the near-surface temperature gradient are used in the numerical model of nanoparticle dynamics in a variable-length presheath. Specific conditions enabling the nanoparticle to overcome the repulsive potential and deposit on the substrate during the discharge operation are investigated. The results are relevant to fabrication of various nanostructured films employing structural incorporation of the plasma-grown nanoparticles, in particular, to nanoparticle deposition in the plasma-enhanced chemical-vapor deposition of carbon nanostructures in hydrocarbon-based plasmas

  16. Synergistic effects of non-thermal plasma-assisted catalyst and ultrasound on toluene removal.

    Science.gov (United States)

    Sun, Yongli; Zhou, Libo; Zhang, Luhong; Sui, Hong

    2012-01-01

    A wire-mesh catalyst coated by La0.8Sr0.2MnO3 was combined with a dielectric barrier discharge (DBD) reactor for toluene removal at atmospheric pressure. It was found that toluene removal efficiency and carbon dioxide selectivity were enhanced in the catalytic packed-bed reactor. In addition, ozone and nitrogen monoxide from the gas effluent byproducts decreased. This is the first time that ultrasound combined with plasma has been used for toluene removal. A synergistic effect on toluene removal was observed in the plasma-assisted ultrasound system. At the same time, the system increased toluene conversion and reduced ozone emission.

  17. CN.sub.x./sub. coatings deposited by pulsored RF supersonic plasma jet: hardness, nitrogenation and optical properties

    Czech Academy of Sciences Publication Activity Database

    Hubička, Zdeněk; Šícha, Miloš; Pajasová, Libuše; Soukup, Ladislav; Jastrabík, Lubomír; Chvostová, Dagmar; Wagner, T.

    142-144, - (2001), s. 681-687 ISSN 0257-8972 R&D Projects: GA ČR GA202/00/1592; GA MŠk LN00A015 Institutional research plan: CEZ:AV0Z1010914 Keywords : carbon nitrides * plasma-chemical deposition * tribology * optical properties Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.236, year: 2001

  18. Development of Localized Arc Filament RF Plasma Actuators for High-Speed and High Reynolds Number Flow Control

    Science.gov (United States)

    2010-01-01

    high-speed flows is problematic due to their low forcing frequency (for mechanical actuators) and low forcing amplitude (for piezo actuators...very low fraction of DC power is coupled to the actuators (5-10%), with the rest of the power dissipated in massive ballast resistors acting as heat... resistors . The use of high-power resistors also significantly increases the weight and size of the plasma generator and makes scaling to a large number of

  19. Surface functionalisation of polypropylene hernia-repair meshes by RF-activated plasma polymerisation of acrylic acid and silver nanoparticles

    Energy Technology Data Exchange (ETDEWEB)

    Nisticò, Roberto, E-mail: roberto.nistico@unito.it [University of Torino, Department of Chemistry and NIS Research Centre, Via P. Giuria 7, 10125 Torino (Italy); Rosellini, Andrea [University of Torino, Department of Chemistry and NIS Research Centre, Via P. Giuria 7, 10125 Torino (Italy); Rivolo, Paola [Politecnico di Torino, Dipartimento di Scienza Applicata e Tecnologia, C.so Duca degli Abruzzi 24, 10129 Torino (Italy); Faga, Maria Giulia [CNR-IMAMOTER, Strada delle Cacce 73, 10135 Torino (Italy); Lamberti, Roberta; Martorana, Selanna [Herniamesh S.r.l., Via F.lli Meliga 1/C, 10034 Chivasso (Italy); Castellino, Micaela [Center for Space Human Robotics, Istituto Italiano di Tecnologia, Corso Trento 21, 10129 Torino (Italy); Virga, Alessandro; Mandracci, Pietro [Politecnico di Torino, Dipartimento di Scienza Applicata e Tecnologia, C.so Duca degli Abruzzi 24, 10129 Torino (Italy); Malandrino, Mery; Magnacca, Giuliana [University of Torino, Department of Chemistry and NIS Research Centre, Via P. Giuria 7, 10125 Torino (Italy)

    2015-02-15

    Graphical abstract: - Highlights: • Polypropylene meshes for hernioplasty were surface functionalised via plasma-polymerisation to confer adhesive properties. • Subsequently, silver nanoparticles were loaded to add antibacterial activity. • Materials were physico-chemical characterised and adhesive properties evaluated. - Abstract: Hernia diseases are among the most common and diffuse causes of surgical interventions. Unfortunately, still nowadays there are different phenomena which can cause the hernioplasty failure, for instance post-operative prostheses displacements and proliferation of bacteria in the surgical site. In order to limit these problems, commercial polypropylene (PP) and polypropylene/Teflon (PP/PTFE) bi-material meshes were surface functionalised to confer adhesive properties (and therefore reduce undesired displacements) using polyacrylic acid synthesized by plasma polymerisation (PPAA). A broad physico-chemical and morphological characterisation was carried out and adhesion properties were investigated by means of atomic force microscopy (AFM) used in force/distance (F/D) mode. Once biomedical devices surface was functionalised by PPAA coating, metallic silver nanoparticles (AgNPs) with antimicrobial properties were synthesised and loaded onto the polymeric prostheses. The effect of the PPAA, containing carboxylic functionalities, adhesive coating towards AgNPs loading capacity was verified by means of X-ray photoelectron spectroscopy (XPS). Preliminary measurement of the Ag loaded amount and release in water were also investigated via inductively coupled plasma atomic emission spectroscopy (ICP-AES). Promising results were obtained for the functionalised biomaterials, encouraging future in vitro and in vivo tests.

  20. RF plasma probe diagnostics: a method for eliminating measurement errors for Langmuir probes with bare protective shields

    Science.gov (United States)

    Riaby, V. A.; Masherov, P. E.; Savinov, V. P.; Yakunin, V. G.

    2018-02-01

    The new DC arc T-plasmatron of long service life [1] is studied. The well known method of the electric field strength measurements in a stabilized arc channel [2] was applied in a modified form as a consequence of the specific form of the presumably diffuse anode spot attached to a gas vortex on the external surface of the anode unit. The electrical field strength was determined assuming that the potential drop across the diffuse anode spot in the new plasmatron was small. This gave the mean argon plasma conductivity: σ≤118 Ohm-1cm-1 for arc currents I ≤ 180 A which agreed with the independent experiment [2] affirming the correctness of the above assumption. Analysis of the known experimental and theoretic data on atmospheric argon plasma conductivity resulted in the selection of R.S.Devoto’s theoretic dependence σ(T) [3] as the most reliable one for T=8000…20000 K at P = 1 atm that allowed the evaluation of the mean argon plasma temperature at the exit of the plasmatron: T ≤ 19500 K.

  1. Manipulator for plasma-assisted machining of components made of materials with low machinability

    International Nuclear Information System (INIS)

    Lyaoshchukov, M.M.; Agadzhanyan, R.A.

    1984-01-01

    The All-Union Scientific-Research and Technological Institute of Pump Engineering developed, and the ''Uralgidromash'' Production Association has adopted, a manipulator with remote control for the plasma-assisted machining (PAM) of components made of materials with low machinability. The manipulator is distinguished by its universal design and can be used for machining both external and internal surfaces of the bodies of revolution and also end faces and various curvilinear surfaces

  2. Plasma and Ion Assistance in Physical Vapor Deposition: A Historical Perspective

    International Nuclear Information System (INIS)

    Anders, Andre

    2007-01-01

    Deposition of films using plasma or plasma-assist can be traced back surprisingly far, namely to the 18th century for arcs and to the 19th century for sputtering. However, only since the 1960s the coatings community considered other processes than evaporation for large scale commercial use. Ion Plating was perhaps the first important process, introducing vapor ionization and substrate bias to generate a beam of ions arriving on the surface of the growing film. Rather independently, cathodic arc deposition was established as an energetic condensation process, first in the former Soviet Union in the 1970s, and in the 1980s in the Western Hemisphere. About a dozen various ion-based coating technologies evolved in the last decades, all characterized by specific plasma or ion generation processes. Gridded and gridless ion sources were taken from space propulsion and applied to thin film deposition. Modeling and simulation have helped to make plasma and ions effects to be reasonably well understood. Yet--due to the complex, often non-linear and non-equilibrium nature of plasma and surface interactions--there is still a place for the experience plasma 'sourcerer'

  3. Surface Phenomena During Plasma-Assisted Atomic Layer Etching of SiO2.

    Science.gov (United States)

    Gasvoda, Ryan J; van de Steeg, Alex W; Bhowmick, Ranadeep; Hudson, Eric A; Agarwal, Sumit

    2017-09-13

    Surface phenomena during atomic layer etching (ALE) of SiO 2 were studied during sequential half-cycles of plasma-assisted fluorocarbon (CF x ) film deposition and Ar plasma activation of the CF x film using in situ surface infrared spectroscopy and ellipsometry. Infrared spectra of the surface after the CF x deposition half-cycle from a C 4 F 8 /Ar plasma show that an atomically thin mixing layer is formed between the deposited CF x layer and the underlying SiO 2 film. Etching during the Ar plasma cycle is activated by Ar + bombardment of the CF x layer, which results in the simultaneous removal of surface CF x and the underlying SiO 2 film. The interfacial mixing layer in ALE is atomically thin due to the low ion energy during CF x deposition, which combined with an ultrathin CF x layer ensures an etch rate of a few monolayers per cycle. In situ ellipsometry shows that for a ∼4 Å thick CF x film, ∼3-4 Å of SiO 2 was etched per cycle. However, during the Ar plasma half-cycle, etching proceeds beyond complete removal of the surface CF x layer as F-containing radicals are slowly released into the plasma from the reactor walls. Buildup of CF x on reactor walls leads to a gradual increase in the etch per cycle.

  4. Investigation of growth, coverage and effectiveness of plasma assisted nano-films of fluorocarbon

    International Nuclear Information System (INIS)

    Joshi, Pratik P.; Pulikollu, Rajasekhar; Higgins, Steven R.; Hu Xiaoming; Mukhopadhyay, S.M.

    2006-01-01

    Plasma-assisted functional films have significant potential in various engineering applications. They can be tailored to impart desired properties by bonding specific molecular groups to the substrate surface. The aim of this investigation was to develop a fundamental understanding of the atomic level growth, coverage and functional effectiveness of plasma nano-films on flat surfaces and to explore their application-potential for complex and uneven shaped nano-materials. In this paper, results on plasma-assisted nano-scale fluorocarbon films, which are known for imparting inertness or hydrophobicity to the surface, will be discussed. The film deposition was studied as a function of time on flat single crystal surfaces of silicon, sapphire and graphite, using microwave plasma. X-ray photoelectron spectroscopy (XPS) was used for detailed study of composition and chemistry of the substrate and coating atoms, at all stages of deposition. Atomic force microscopy (AFM) was performed in parallel to study the coverage and growth morphology of these films at each stage. Combined XPS and AFM results indicated complete coverage of all the substrates at the nanometer scale. It was also shown that these films grew in a layer-by-layer fashion. The nano-films were also applied to complex and uneven shaped nano-structured and porous materials, such as microcellular porous foam and nano fibers. It was seen that these nano-films can be a viable approach for effective surface modification of complex or uneven shaped nano-materials

  5. Large area ion and plasma beam sources

    Energy Technology Data Exchange (ETDEWEB)

    Waldorf, J. [IPT Ionen- und Plasmatech. GmbH, Kaiserslautern (Germany)

    1996-06-01

    In the past a number of ion beam sources utilizing different methods for plasma excitation have been developed. Nevertheless, a widespread use in industrial applications has not happened, since the sources were often not able to fulfill specific demands like: broad homogeneous ion beams, compatibility with reactive gases, low ion energies at high ion current densities or electrical neutrality of the beam. Our contribution wants to demonstrate technical capabilities of rf ion and plasma beam sources, which can overcome the above mentioned disadvantages. The physical principles and features of respective sources are presented. We report on effective low pressure plasma excitation by electron cyclotron wave resonance (ECWR) for the generation of dense homogeneous plasmas and the rf plasma beam extraction method for the generation of broad low energy plasma beams. Some applications like direct plasma beam deposition of a-C:H and ion beam assisted deposition of Al and Cu with tailored thin film properties are discussed. (orig.).

  6. Large area ion and plasma beam sources

    International Nuclear Information System (INIS)

    Waldorf, J.

    1996-01-01

    In the past a number of ion beam sources utilizing different methods for plasma excitation have been developed. Nevertheless, a widespread use in industrial applications has not happened, since the sources were often not able to fulfill specific demands like: broad homogeneous ion beams, compatibility with reactive gases, low ion energies at high ion current densities or electrical neutrality of the beam. Our contribution wants to demonstrate technical capabilities of rf ion and plasma beam sources, which can overcome the above mentioned disadvantages. The physical principles and features of respective sources are presented. We report on effective low pressure plasma excitation by electron cyclotron wave resonance (ECWR) for the generation of dense homogeneous plasmas and the rf plasma beam extraction method for the generation of broad low energy plasma beams. Some applications like direct plasma beam deposition of a-C:H and ion beam assisted deposition of Al and Cu with tailored thin film properties are discussed. (orig.)

  7. RF transformer

    Science.gov (United States)

    Smith, James L.; Helenberg, Harold W.; Kilsdonk, Dennis J.

    1979-01-01

    There is provided an improved RF transformer having a single-turn secondary of cylindrical shape and a coiled encapsulated primary contained within the secondary. The coil is tapered so that the narrowest separation between the primary and the secondary is at one end of the coil. The encapsulated primary is removable from the secondary so that a variety of different capacity primaries can be utilized with one secondary.

  8. Ion-assisted functional monolayer coating of nanorod arrays in hydrogen plasmas

    International Nuclear Information System (INIS)

    Tam, E.; Levchenko, I.; Ostrikov, K.; Keidar, M.; Xu, S.

    2007-01-01

    Uniformity of postprocessing of large-area, dense nanostructure arrays is currently one of the greatest challenges in nanoscience and nanofabrication. One of the major issues is to achieve a high level of control in specie fluxes to specific surface areas of the nanostructures. As suggested by the numerical experiments in this work, this goal can be achieved by manipulating microscopic ion fluxes by varying the plasma sheath and nanorod array parameters. The dynamics of ion-assisted deposition of functional monolayer coatings onto two-dimensional carbon nanorod arrays in a hydrogen plasma is simulated by using a multiscale hybrid numerical simulation. The numerical results show evidence of a strong correlation between the aspect ratios and nanopattern positioning of the nanorods, plasma sheath width, and densities and distributions of microscopic ion fluxes. When the spacing between the nanorods and/or their aspect ratios are larger, and/or the plasma sheath is wider, the density of microscopic ion current flowing to each of the individual nanorods increases, thus reducing the time required to apply a functional monolayer coating down to 11 s for a 7-μm-wide sheath, and to 5 s for a 50-μm-wide sheath. The computed monolayer coating development time is consistent with previous experimental reports on plasma-assisted functionalization of related carbon nanostructures [B. N. Khare et al., Appl. Phys. Lett. 81, 5237 (2002)]. The results are generic in that they can be applied to a broader range of plasma-based processes and nanostructures, and contribute to the development of deterministic strategies of postprocessing and functionalization of various nanoarrays for nanoelectronic, biomedical, and other emerging applications

  9. Double plasma system with inductively coupled source plasma and quasi-quiescent target plasma

    International Nuclear Information System (INIS)

    Massi, M.; Maciel, H.S.

    1995-01-01

    Cold plasmas have successfully been used in the plasma-assisted material processing industry. An understanding of the physicochemical mechanisms involved in the plasma-surface interaction is needed for a proper description of deposition and etching processes at material surfaces. Since these mechanisms are dependent on the plasma properties, the development of diagnostic techniques is strongly desirable for determination of the plasma parameters as well as the characterization of the electromagnetic behaviour of the discharge. In this work a dual discharge chamber, was specially designed to study the deposition of thin films via plasma polymerization process. In the Pyrex chamber an inductively coupled plasma can be excited either in the diffuse low density E-mode or in the high density H-mode. This plasma diffuses into the cylindrical stainless steel chamber which is covered with permanent magnets to produce a multidipole magnetic field configuration at the surface. By that means a double plasma is established consisting of a RF source plasma coupled to a quasi-quiescent target plasma. The preliminary results presented here refer to measurements of the profiles of plasma parameters along the central axis of the double plasma apparatus. Additionally a spectrum analysis performed by means of a Rogowski coil probe immersed into the source plasma is also presented. The discharge is made in argon with pressure varying from 10 -2 to 1 torr, and the rf from 10 to 150 W

  10. Surface stoichiometry modification and improved DC/RF characteristics by plasma treated and annealed AlGaN/GaN HEMTs

    Science.gov (United States)

    Upadhyay, Bhanu B.; Takhar, Kuldeep; Jha, Jaya; Ganguly, Swaroop; Saha, Dipankar

    2018-03-01

    We demonstrate that N2 and O2 plasma treatment followed by rapid thermal annealing leads to surface stoichiometry modification in a AlGaN/GaN high electron mobility transistor. Both the source/drain access and gate regions respond positively improving the transistor characteristics albeit to different extents. Characterizations indicate that the surface show the characteristics of that of a higher band-gap material like AlxOy and GaxOy along with N-vacancy in the sub-surface region. The N-vacancy leads to an increased two-dimensional electron gas density. The formation of oxides lead to a reduced gate leakage current and surface passivation. The DC characteristics show increased transconductance, saturation drain current, ON/OFF current ratio, sub-threshold swing and lower ON resistance by a factor of 2.9, 2.0, 103.3 , 2.3, and 2.1, respectively. The RF characteristics show an increase in unity current gain frequency by a factor of 1.7 for a 500 nm channel length device.

  11. Fabrication of PDMS through-holes using the MIMIC method and the surface treatment by atmospheric-pressure CH4/He RF plasma

    Science.gov (United States)

    Choi, Jongchan; Lee, Kyeong-Hwan; Yang, Sung

    2011-09-01

    This note presents a simple fabrication process for patterning micro through-holes in a PDMS layer by a combination of the micromolding in capillaries (MIMIC) method and the surface treatment by atmospheric-pressure CH4/He RF plasma. The fabrication process is confirmed by forming micro through-holes with various shapes including circle, C-shape, open microfluidic channel and hemisphere. All micro through-holes of various shapes in a wide range of diameters and heights are well fabricated by the proposed method. Also, a 3D micromixer containing a PDMS micro through-hole layer formed by the proposed method is built and its performance is tested as another practical demonstration of the proposed fabrication method. Therefore, we believe that the proposed fabrication process will build a PDMS micro through-hole layer in a simple and easy way and will contribute to developing highly efficient multi-layered microfluidic systems, which may require PDMS micro through-hole layers.

  12. Structural and optical studies of GaN pn-junction with AlN buffer layer grown on Si (111) by RF plasma enhanced MBE

    Energy Technology Data Exchange (ETDEWEB)

    Yusoff, Mohd Zaki Mohd; Hassan, Zainuriah; Woei, Chin Che; Hassan, Haslan Abu; Abdullah, Mat Johar [Nano-Optoelectronics Research and Technology Laboratory School of Physics, Universiti Sains Malaysia, 11800 Penang, Malaysia and Department of Applied Sciences Universiti Teknologi MARA (UiTM) 13500 Permatang Pauh, Penang (Malaysia); Department of Applied Sciences Universiti Teknologi MARA (UiTM) 13500 Permatang Pauh, Penang (Malaysia)

    2012-06-29

    GaN pn-junction grown on silicon substrates have been the focus in a number of recent reports and further effort is still necessary to improve its crystalline quality for practical applications. GaN has the high n-type background carrier concentration resulting from native defects commonly thought to be nitrogen vacancies. In this work, we present the growth of pn-junction of GaN on Si (111) substrate using RF plasma-enhanced molecular beam epitaxy (MBE). Both of the layers show uniformity with an average thickness of 0.709 {mu}m and 0.095 {mu}m for GaN and AlN layers, respectively. The XRD spectra indicate that no sign of cubic phase of GaN are found, so it is confirmed that the sample possessed hexagonal structure. It was found that all the allowed Raman optical phonon modes of GaN, i.e. the E2 (low), E1 (high) and A1 (LO) are clearly visible.

  13. Spatio-temporal analysis of the electron power absorption in electropositive capacitive RF plasmas based on moments of the Boltzmann equation

    Science.gov (United States)

    Schulze, J.; Donkó, Z.; Lafleur, T.; Wilczek, S.; Brinkmann, R. P.

    2018-05-01

    Power absorption by electrons from the space- and time-dependent electric field represents the basic sustaining mechanism of all radio-frequency driven plasmas. This complex phenomenon has attracted significant attention. However, most theories and models are, so far, only able to account for part of the relevant mechanisms. The aim of this work is to present an in-depth analysis of the power absorption by electrons, via the use of a moment analysis of the Boltzmann equation without any ad-hoc assumptions. This analysis, for which the input quantities are taken from kinetic, particle based simulations, allows the identification of all physical mechanisms involved and an accurate quantification of their contributions. The perfect agreement between the sum of these contributions and the simulation results verifies the completeness of the model. We study the relative importance of these mechanisms as a function of pressure, with high spatial and temporal resolution, in an electropositive argon discharge. In contrast to some widely accepted previous models we find that high space- and time-dependent ambipolar electric fields outside the sheaths play a key role for electron power absorption. This ambipolar field is time-dependent within the RF period and temporally asymmetric, i.e., the sheath expansion is not a ‘mirror image’ of the sheath collapse. We demonstrate that this time-dependence is mainly caused by a time modulation of the electron temperature resulting from the energy transfer to electrons by the ambipolar field itself during sheath expansion. We provide a theoretical proof that this ambipolar electron power absorption would vanish completely, if the electron temperature was constant in time. This mechanism of electron power absorption is based on a time modulated electron temperature, markedly different from the Hard Wall Model, of key importance for energy transfer to electrons on time average and, thus, essential for the generation of capacitively

  14. Ion-substituted calcium phosphate coatings deposited by plasma-assisted techniques: A review.

    Science.gov (United States)

    Graziani, Gabriela; Bianchi, Michele; Sassoni, Enrico; Russo, Alessandro; Marcacci, Maurilio

    2017-05-01

    One of the main critical aspects behind the failure or success of an implant resides in its ability to fast bond with the surrounding bone. To boost osseointegration, the ideal implant material should exhibit composition and structure similar to those of biological apatite. To this aim, the most common approach is to coat the implant surface with a coating of hydroxyapatite (HA), resembling the main component of mineralized tissues. However, bone apatite is a non-stoichiometric, multi-substituted poorly-crystalline apatite, containing significant amounts of foreign ions, with high biological relevance. Ion-substituted HAs can be deposited by so called "wet methods", which are however poorly reproducible and hardly industrially feasible; at the same time bioactive coatings realized by plasma assisted method, interesting for industrial applications, are generally made of stoichiometric (i.e. un-substituted) HA. In this work, the literature concerning plasma-assisted deposition methods used to deposit ion-substituted HA was reviewed and the last advances in this field discussed. The ions taken into exam are those present in mineralized tissues and possibly having biological relevance. Notably, literature about this topic is scarce, especially relating to in vivo animal and clinical trials; further on, available studies evaluate the performance of substituted coatings from different points of view (mechanical properties, bone growth, coating dissolution, etc.) which hinders a proper evaluation of the real efficacy of ion-doped HA in promoting bone regeneration, compared to stoichiometric HA. Moreover, results obtained for plasma sprayed coatings (which is the only method currently employed for deposition at the industrial scale) were collected and compared to those of novel plasma-assisted techniques, that are expected to overcome its limitations. Data so far available on the topic were discussed to highlight advantages, limitations and possible perspectives of these

  15. Plasma-assisted CO2 conversion: optimizing performance via microwave power modulation

    Science.gov (United States)

    Britun, Nikolay; Silva, Tiago; Chen, Guoxing; Godfroid, Thomas; van der Mullen, Joost; Snyders, Rony

    2018-04-01

    Significant improvement in the energy efficiency of plasma-assisted CO2 conversion is achieved with applied power modulation in a surfaguide microwave discharge. The obtained values of CO2 conversion and energy efficiency are, respectively, 0.23 and 0.33 for a 0.95 CO2  +  0.05 N2 gas mixture. Analysis of the energy relaxation mechanisms shows that power modulation can potentially affect the vibrational-translational energy exchange in plasma. In our case, however, this mechanism does not play a major role, likely due to the low degree of plasma non-equilibrium in the considered pressure range. Instead, the gas residence time in the discharge active zone together with plasma pulse duration are found to be the main factors affecting the CO2 conversion efficiency at low plasma pulse repetition rates. This effect is confirmed experimentally by the in situ time-resolved two-photon absorption laser-induced fluorescence measurements of CO molecular density produced in the discharge as a result of CO2 decomposition.

  16. Structural, Optical, and Electrical Characterization of β-Ga2O3 Thin Films Grown by Plasma-Assisted Molecular Beam Epitaxy Suitable for UV Sensing

    Directory of Open Access Journals (Sweden)

    Abraham Arias

    2018-01-01

    Full Text Available β-Ga2O3 thin films were grown on c-plane sapphire substrates by plasma-assisted molecular beam epitaxy. The films were grown using an elemental gallium source and oxygen supplied by an RF plasma source. Reflection high-energy electron diffraction (RHEED was used to monitor the surface quality in real time. Both in situ RHEED and ex situ X-ray diffraction confirmed the formation of single crystal β-phase films with excellent crystallinity on c-plane sapphire. Spectroscopic ellipsometry was used to determine the film thicknesses, giving values in the 11.6–18.8 nm range and the refractive index dispersion curves. UV-Vis transmittance measurements revealed that strong absorption of β-Ga2O3 starts at ∼270 nm. Top metal contacts were deposited by thermal evaporation for I-V characterization, which has been carried out in dark, as well as under visible and UV light illumination. The optical and electrical measurements showed that the grown thin films of β-Ga2O3 are excellent candidates for deep-ultraviolet detection and sensing.

  17. Investigation of flame structure in plasma-assisted turbulent premixed methane-air flame

    Science.gov (United States)

    Hualei, ZHANG; Liming, HE; Jinlu, YU; Wentao, QI; Gaocheng, CHEN

    2018-02-01

    The mechanism of plasma-assisted combustion at increasing discharge voltage is investigated in detail at two distinctive system schemes (pretreatment of reactants and direct in situ discharge). OH-planar laser-induced fluorescence (PLIF) technique is used to diagnose the turbulent structure methane-air flame, and the experimental apparatus consists of dump burner, plasma-generating system, gas supply system and OH-PLIF system. Results have shown that the effect of pretreatment of reactants on flame can be categorized into three regimes: regime I for voltage lower than 6.6 kV; regime II for voltage between 6.6 and 11.1 kV; and regime III for voltage between 11.1 and 12.5 kV. In regime I, aerodynamic effect and slower oxidation of higher hydrocarbons generated around the inner electrode tip plays a dominate role, while in regime III, the temperature rising effect will probably superimpose on the chemical effect and amplify it. For wire-cylinder dielectric barrier discharge reactor with spatially uneven electric field, the amount of radicals and hydrocarbons are decreased monotonically in radial direction which affects the flame shape. With regard to in situ plasma discharge in flames, the discharge pattern changes from streamer type to glow type. Compared with the case of reactants pretreatment, the flame propagates further in the upstream direction. In the discharge region, the OH intensity is highest for in situ plasma assisted combustion, indicating that the plasma energy is coupled into flame reaction zone.

  18. A parametric study of the microwave plasma-assisted combustion of premixed ethylene/air mixtures

    Science.gov (United States)

    Fuh, Che A.; Wu, Wei; Wang, Chuji

    2017-11-01

    A parametric study of microwave argon plasma assisted combustion (PAC) of premixed ethylene/air mixtures was carried out using visual imaging, optical emission spectroscopy and cavity ringdown spectroscopy as diagnostic tools. The parameters investigated included the plasma feed gas flow rate, the plasma power, the fuel equivalence ratio and the total flow rate of the fuel/air mixture. The combustion enhancement effects were characterized by the minimum ignition power, the flame length and the fuel efficiency of the combustor. It was found that: (1) increasing the plasma feed gas flow rate resulted in a decrease in the flame length, an increase in the minimum ignition power for near stoichiometric fuel equivalence ratios and a corresponding decrease in the minimum ignition power for ultra-lean and rich fuel equivalence ratios; (2) at a constant plasma power, increasing the total flow rate of the ethylene/air mixture from 1.0 slm to 1.5 slm resulted in an increase in the flame length and a reduction in the fuel efficiency; (3) increasing the plasma power resulted in a slight increase in flame length as well as improved fuel efficiency with fewer C2(d) and CH(A) radicals present downstream of the flame; (4) increasing the fuel equivalence ratio caused an increase in flame length but at a reduced fuel efficiency when plasma power was kept constant; and (5) the ground state OH(X) number density was on the order of 1015 molecules/cm3 and was observed to drop downstream along the propagation axis of the flame at all parameters investigated. Results suggest that each of the parameters independently influences the PAC processes.

  19. Bevalac injector final stage RF amplifier upgrades

    International Nuclear Information System (INIS)

    Howard, D.; Calvert, J.; Dwinell, R.; Lax, J.; Lindner, A.; Richter, R.; Ridgeway, W.

    1991-01-01

    With the assistance of the DOE In-house Energy Management Program, the Bevalac injector final stage RF amplifier systems have been successfully upgraded to reduce energy consumption and operating costs. This recently completed project removed the energy-inefficient plate voltage modulator circuits that were used in conjunction with the final stage RF amplifiers. Construction, design, and operating parameters are described in detail

  20. Powder agglomeration study in RF silane plasmas by in situ polarization-sensitive laser light scattering and TEM measurements

    Energy Technology Data Exchange (ETDEWEB)

    Courteille, C; Hollenstein, C; Dorier, J L; Gay, P; Schwarzenbach, W; Howling, A A [Ecole Polytechnique Federale, Lausanne (Switzerland). Centre de Recherche en Physique des Plasma (CRPP); Bertran, E; Viera, G [Barcelona Univ., Dep. de de Fisica Aplicada I Electronica, Barcelona (Spain); Martins, R; Macarico, A [FCTUNL, Materials Science Dep., Monte de Caparica (Portugal)

    1966-03-01

    To determine self-consistently the time evolution of particle size and their number density in situ multi-angle polarization laser light scattering was used. Cross-polarization intensities (incident and scattered light intensities with opposite polarization) measured at 135{sup o} and ex-situ TEM analysis demonstrate the existence of non-spherical agglomerates during the early phase of agglomeration. Later in the particle time development both techniques reveal spherical particles again. The presence of strong cross-polarization intensities is accompanied by low frequency instabilities detected on the scattered light intensities and plasma emission. It is found that the particle radius and particle number density during the agglomeration phase can be well described by the Brownian Free Molecule Coagulation model. Application of this neutral particle coagulation model is justified by calculation of the particle charge whereby it is shown that particles of a few tens of nanometer can be considered as neutral under our experimental conditions. The measured particle dispersion can be well described by a Brownian Free Molecule Coagulation model including a log-normal particle size distribution. (author) 11 figs., 48 refs.

  1. Powder agglomeration study in RF silane plasmas by in situ polarization-sensitive laser light scattering and TEM measurements

    International Nuclear Information System (INIS)

    Courteille, C.; Hollenstein, C.; Dorier, J.L.; Gay, P.; Schwarzenbach, W.; Howling, A.A.; Bertran, E.; Viera, G.; Martins, R.; Macarico, A.

    1966-03-01

    To determine self-consistently the time evolution of particle size and their number density in situ multi-angle polarization laser light scattering was used. Cross-polarization intensities (incident and scattered light intensities with opposite polarization) measured at 135 o and ex-situ TEM analysis demonstrate the existence of non-spherical agglomerates during the early phase of agglomeration. Later in the particle time development both techniques reveal spherical particles again. The presence of strong cross-polarization intensities is accompanied by low frequency instabilities detected on the scattered light intensities and plasma emission. It is found that the particle radius and particle number density during the agglomeration phase can be well described by the Brownian Free Molecule Coagulation model. Application of this neutral particle coagulation model is justified by calculation of the particle charge whereby it is shown that particles of a few tens of nanometer can be considered as neutral under our experimental conditions. The measured particle dispersion can be well described by a Brownian Free Molecule Coagulation model including a log-normal particle size distribution. (author) 11 figs., 48 refs

  2. Effect of actuating voltage and discharge gap on plasma assisted detonation initiation process

    Science.gov (United States)

    Siyin, ZHOU; Xueke, CHE; Wansheng, NIE; Di, WANG

    2018-06-01

    The influence of actuating voltage and discharge gap on plasma assisted detonation initiation by alternating current dielectric barrier discharge was studied in detail. A loose coupling method was used to simulate the detonation initiation process of a hydrogen–oxygen mixture in a detonation tube under different actuating voltage amplitudes and discharge gap sizes. Both the discharge products and the detonation forming process assisted by the plasma were analyzed. It was found that the patterns of the temporal and spatial distributions of discharge products in one cycle keep unchanged as changing the two discharge operating parameters. However, the adoption of a higher actuating voltage leads to a higher active species concentration within the discharge zone, and atom H is the most sensitive to the variations of the actuating voltage amplitude among the given species. Adopting a larger discharge gap results in a lower concentration of the active species, and all species have the same sensitivity to the variations of the gap. With respect to the reaction flow of the detonation tube, the corresponding deflagration to detonation transition (DDT) time and distance become slightly longer when a higher actuating voltage is chosen. The acceleration effect of plasma is more prominent with a smaller discharge gap, and the benefit builds gradually throughout the DDT process. Generally, these two control parameters have little effect on the amplitude of the flow field parameters, and they do not alter the combustion degree within the reaction zone.

  3. Plasma-nitriding assisted micro-texturing into stainless steel molds

    Directory of Open Access Journals (Sweden)

    Aizawa Tatsuhiko

    2015-01-01

    Full Text Available Micro-texturing has grown up to be one of the most promising procedures. This related application required for large-area, fine micro-texturing onto the stainless steel mold materials. A new method other than laser-machining, micro-milling or micro-EDM was awaited for further advancement of this micro-texturing. In the present paper, a plasma nitriding assisted micro-texturing was developed to make various kinds of micro-patterns onto the martensitic stainless steels. First, original patterns were printed onto the surface of substrate by using the ink-jet printer. Then, the masked substrate was subjected to high density plasma nitriding; the un-masked surfaces were nitrided to have higher hardness. This nitrided substrate was further treated by sand-blasting to selectively dig the soft, masked surfaces. Finally, the micro-patterned martensitic stainless steel substrate was fabricated as a mold to duplicate these micro-patterns onto the work materials. The spatial resolution and depth profile controllability of this plasma nitriding assisted micro-texturing was investigated for variety of initial micro-patterns. The original size and dimension of initial micro-patterns were precisely compared with the three dimensional geometry of micro-textures after blasting treatment. The plastic cover case for smart cellular phones was employed to demonstrate how useful this processing is in practice.

  4. Radio frequency plasma excitation

    International Nuclear Information System (INIS)

    Burden, M.St.J.; Cross, K.B.

    1979-01-01

    An investigation into the use of rf sputtering for ion cleaning of insulating substrates before ion plating is reported. Initial experiments consisted of sputtering metals with rf power followed by the deposition of copper onto glass slides using rf plasma excitation and biasing supply. It was found that good quality films were obtained by rf ion plating onto plastics with excellent adhesion over a wide operating pressure range. A block schematic of the rf plasma excitation system is shown. (UK)

  5. Profiles of plasma parameters and density of negative hydrogen ions by laser detachment measurements in RF-driven ion sources; Profile der Plasmaparameter und Dichte negativer Wasserstoffionen mittels Laserdetachmentmessungen in HF-angeregten Ionenquellen

    Energy Technology Data Exchange (ETDEWEB)

    Christ-Koch, Sina

    2007-12-20

    This work shows the application of the Laserdetachment method for spatially resolved measurements of negative Hydrogen/Deuterium ion density. It was applied on a high power low pressure RF-driven ion source. The Laser detachment method is based on the measurement of electron currents on a positively biased Langmuir probe before and during/after a laser pulse. The density ratio of negative ions to electrons can be derived from the ratio of currents to the probe. The absolute density of negative ions can be obtained when the electron density is measured with the standard Langmuir probe setup. Measurements with the Langmuir probe additionally yield information about the floating and plasma potential, the electron temperature and the density of positive ions. The Laser detachment setup had to be adapted to the special conditions of the RF-driven source. In particular the existence of RF fields (1 MHz), high source potential (-20 kV), magnetic fields ({proportional_to} 7 mT) and caesium inside the source had to be considered. The density of negative ions could be identified in the range of n(H{sup -})=1.10{sup 17} 1/m{sup 3}, which is in the same order of magnitude as the electron density. Only the application of the Laser detachment method with the Langmuir probe measurements will yield spatially resolved plasma parameters and H- density profiles. The influence of diverse external parameters, such as pressure, RF-power, magnetic fields on the plasma parameters and their profiles were studied and explained. Hence, the measurements lead to a detailed understanding of the processes inside the source. (orig.)

  6. Plasma Assisted Chemical Vapour Deposition – Technological Design Of Functional Coatings

    Directory of Open Access Journals (Sweden)

    Januś M.

    2015-06-01

    Full Text Available Plasma Assisted Chemical Vapour Deposition (PA CVD method allows to deposit of homogeneous, well-adhesive coatings at lower temperature on different substrates. Plasmochemical treatment significantly impacts on physicochemical parameters of modified surfaces. In this study we present the overview of the possibilities of plasma processes for the deposition of diamond-like carbon coatings doped Si and/or N atoms on the Ti Grade2, aluminum-zinc alloy and polyetherketone substrate. Depending on the type of modified substrate had improved the corrosion properties including biocompatibility of titanium surface, increase of surface hardness with deposition of good adhesion and fine-grained coatings (in the case of Al-Zn alloy and improving of the wear resistance (in the case of PEEK substrate.

  7. Atmospheric Pressure Plasma Jet-Assisted Synthesis of Zeolite-Based Low-k Thin Films.

    Science.gov (United States)

    Huang, Kai-Yu; Chi, Heng-Yu; Kao, Peng-Kai; Huang, Fei-Hung; Jian, Qi-Ming; Cheng, I-Chun; Lee, Wen-Ya; Hsu, Cheng-Che; Kang, Dun-Yen

    2018-01-10

    Zeolites are ideal low-dielectric constant (low-k) materials. This paper reports on a novel plasma-assisted approach to the synthesis of low-k thin films comprising pure-silica zeolite MFI. The proposed method involves treating the aged solution using an atmospheric pressure plasma jet (APPJ). The high reactivity of the resulting nitrogen plasma helps to produce zeolite crystals with high crystallinity and uniform crystal size distribution. The APPJ treatment also remarkably reduces the time for hydrothermal reaction. The zeolite MFI suspensions synthesized with the APPJ treatment are used for the wet deposition to form thin films. The deposited zeolite thin films possessed dense morphology and high crystallinity, which overcome the trade-off between crystallinity and film quality. Zeolite thin films synthesized using the proposed APPJ treatment achieve low leakage current (on the order of 10 -8 A/cm 2 ) and high Young's modulus (12 GPa), outperforming the control sample synthesized without plasma treatment. The dielectric constant of our zeolite thin films was as low as 1.41. The overall performance of the low-k thin films synthesized with the APPJ treatment far exceed existing low-k films comprising pure-silica MFI.

  8. Plasma-assisted deposition of microcapsule containing Aloe vera extract for cosmeto-textiles

    Science.gov (United States)

    Nascimento do Carmo, S.; Zille, A.; Souto, A. P.

    2017-10-01

    Dielectric Barrier Discharge (DBD) atmospheric-pressure plasma was employed to enhance the deposition of commercial microcapsules (MCs) containing Aloe vera extract onto a cotton/polyester (50:50) fabric. DBD conditions were optimized in term of energy dosage and contact angle. The MCs were applied by padding and printing methods and the coatings were characterized in terms of SEM and FTIR. MCs display a spherical shape with size between 2 and 8 μm with an average wall thickness of 0.5 μm. The MCs applied by printing and pretreated with a plasma dosage of 1.6 kW m2 min-1 showed the best results with an increased adhesion of 200% and significant penetration of MCs into the fibres network. Plasma printed fabric retained 230% more MCs than untreated fabric after 10 washing cycles. However, the coating resistance between unwashed and washed samples was only improved by 5%. Considering the fact that no binder or crosslinking agents were used, the DBD plasma-assisted deposition of MCs revealed to be a promising environmental safe and low cost coating technology.

  9. Colour marking of transparent materials by laser-induced plasma-assisted ablation (LIPAA)

    International Nuclear Information System (INIS)

    Hanada, Yasutaka; Sugioka, Koji; Miyamoto, Iwao; Midorikawa, Katsumi

    2007-01-01

    We demonstrate colour marking of a transparent material using laser-induced plasma-assisted ablation (LIPAA) system. After the LIPAA process, metal thin film is deposited on the surface of the ablated groove. This feature is applied to RGB (red, green and blue) colour marking by using specific metal targets. The metal targets, for instance, are Pb 3 O 4 for red, Cr 2 O 3 for green and [Cu(C 32 H 15 ClN 8 )] for blue colour marking. Additionally, adhesion of the metal thin film deposited on the processed groove by various experimental conditions is investigated

  10. Real time ellipsometry for monitoring plasma-assisted epitaxial growth of GaN

    Energy Technology Data Exchange (ETDEWEB)

    Bruno, Giovanni [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR and INSTM UdR Bari, via Orabona, 4, 70126 Bari (Italy); Losurdo, Maria [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR and INSTM UdR Bari, via Orabona, 4, 70126 Bari (Italy)]. E-mail: maria.losurdo@ba.imip.cnr.it; Giangregorio, Maria M. [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR and INSTM UdR Bari, via Orabona, 4, 70126 Bari (Italy); Capezzuto, Pio [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR and INSTM UdR Bari, via Orabona, 4, 70126 Bari (Italy); Brown, April S. [Department of Electrical and Computer Engineering, Duke University, 128 Hudson Hall, Durham, NC (United States); Kim, Tong-Ho [Department of Electrical and Computer Engineering, Duke University, 128 Hudson Hall, Durham, NC (United States); Choi, Soojeong [Department of Electrical and Computer Engineering, Duke University, 128 Hudson Hall, Durham, NC (United States)

    2006-10-31

    GaN is grown on Si-face 4H-SiC(0 0 0 1) substrates using remote plasma-assisted methods including metalorganic chemical vapour deposition (RP-MOCVD) and molecular beam epitaxy (MBE). Real time spectroscopic ellipsometry is used for monitoring all the steps of substrate pre-treatments and the heteroepitaxial growth of GaN on SiC. Our characterization emphasis is on understanding the nucleation mechanism and the GaN growth mode, which depend on the SiC surface preparation.

  11. Plasma assisted measurements of alkali metal concentrations in pressurized combustion processes

    International Nuclear Information System (INIS)

    Hernberg, R.; Haeyrinen, V.

    1995-01-01

    The plasma assisted method for continuous measurement of alkali metal concentrations in product gas flows of pressurized energy processes will be tested and applied at the 1.6 MW PFBC/G facility at Delft University of Technology in the Netherlands. Measurements will be performed during 1995 and 1996 at different stages of the research programme. The results are expected to give information about the influence of different process conditions on the generation of alkali metal vapours, the comparison of different methods for alkali measurement and the specific performance of our system. The project belongs to the Joule II extension program under contract JOU2-CT93-0431. (author)

  12. Structure and optical band-gap energies of Ba0.5Sr0.5TiO3 thin films fabricated by RF magnetron plasma sputtering

    International Nuclear Information System (INIS)

    Xu, Zhimou; Suzuki, Masato; Yokoyama, Shin

    2005-01-01

    The structure and optical band-gap energies of Ba 0.5 Sr 0.5 TiO 3 (BST0.5) thin films prepared on SiO 2 /Si and fused quartz substrates by RF magnetron plasma sputtering were studied in terms of deposition temperature and film thickness. Highly (100)-oriented BST0.5 thin films were successfully sputtered on a Si substrate with an approximately 1.0-μm-thick SiO 2 layer at a deposition temperature of above 450degC. The optical transmittance of BST0.5 thin films weakly depended on the magnitude of X-ray diffraction (XRD) peak intensity. This is very helpful for monolithic integration of BST0.5 films for electrooptical functions directly onto a SiO 2 /Si substrate. The band-gap energies showed a strong dependence on the deposition temperature and film thickness. It was mainly related to the quantum size effect and the influence of the crystallinity of thin films, such as grain boundaries, grain size, oriented growth, and the existence of an amorphous phase. The band-gap energy values, which were much larger than those of single crystals, decreased with the increase in the deposition temperature and the thickness of BST0.5 thin films. The band-gap energy of 311-nm-thick amorphous BST0.5 thin film was about 4.45 eV and that of (100)-oriented BST0.5 thin film with a thickness of 447 nm was about 3.89 eV. It is believed that the dependence of the band-gap energies of the thin films on the crystallinity for various values of deposition temperature and film thickness means that there could be application in integrated optical devices. (author)

  13. Evaluation of mechanism of cold atmospheric pressure plasma assisted polymerization of acrylic acid on low density polyethylene (LDPE) film surfaces: Influence of various gaseous plasma pretreatment

    Science.gov (United States)

    Ramkumar, M. C.; Pandiyaraj, K. Navaneetha; Arun Kumar, A.; Padmanabhan, P. V. A.; Uday Kumar, S.; Gopinath, P.; Bendavid, A.; Cools, P.; De Geyter, N.; Morent, R.; Deshmukh, R. R.

    2018-05-01

    Owing to its exceptional physiochemical properties, low density poly ethylene (LDPE) has wide range of tissue engineering applications. Conversely, its inadequate surface properties make LDPE an ineffectual candidate for cell compatible applications. Consequently, plasma-assisted polymerization with a selected precursor is a good choice for enhancing its biocompatibility. The present investigation studies the efficiency of plasma polymerization of acrylic acid (AAC) on various gaseous plasma pretreated LDPE films by cold atmospheric pressure plasma, to enhance its cytocompatibility. The change in chemical composition and surface topography of various gaseous plasma pretreated and acrylic deposited LDPE films has been assessed by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The changes in hydrophilic nature of surface modified LDPE films were studied by contact angle (CA) analysis. Cytocompatibility of the AAC/LDPE films was also studied in vitro, using RIN-5F cells. The results acquired by the XPS and AFM analysis clearly proved that cold atmospheric pressure (CAP) plasma assisted polymerization of AAC enhances various surface properties including carboxylic acid functional group density and increased surface roughness on various gaseous plasma treated AAC/LDPE film surfaces. Moreover, contact angle analysis clearly showed that the plasma polymerized samples were hydrophilic in nature. In vitro cytocompatibility analysis undoubtedly validates that the AAC polymerized various plasma pretreated LDPE films surfaces stimulate cell distribution and proliferation compared to pristine LDPE films. Similarly, cytotoxicity analysis indicates that the AAC deposited various gaseous plasma pretreated LDPE film can be considered as non-toxic as well as stimulating cell viability significantly. The cytocompatible properties of AAC polymerized Ar + O2 plasma pretreated LDPE films were found to be more pronounced compared to the other plasma pretreated

  14. Plasma assisted measurements of alkali metal concentrations in pressurized combustion processes

    Energy Technology Data Exchange (ETDEWEB)

    Hernberg, R.; Haeyrinen, V. [Tampere Univ. of Technology (Finland). Dept. of Physics

    1996-12-01

    The plasma assisted method for continuous measurement of alkali concentrations in product gas flows of pressurized energy processes will be tested and applied at the 1.6 MW PFBC/G facility at Delft University of Technology in the Netherlands. During the reporting period the alkali measuring device has been tested under pressurized conditions at VTT Energy, DMT, Foster-Wheeler Energia and ABB Carbon. Measurements in Delft will be performed during 1996 after installation of the hot gas filter. The original plan for measurements in Delft has been postponed due to schedule delays in Delft. The results are expected to give information about the influence of different process conditions on the generation of alkali vapours, the comparison of different methods for alkali measurement and the specific performance of our system. This will be the first test of the plasma assisted measurement method in a gasification process. The project belongs to the Joule II extension program under contract JOU2-CT93-0431. (author)

  15. Uncertainty propagation in modeling of plasma-assisted hydrogen production from biogas

    Science.gov (United States)

    Zaherisarabi, Shadi; Venkattraman, Ayyaswamy

    2016-10-01

    With the growing concern of global warming and the resulting emphasis on decreasing greenhouse gas emissions, there is an ever-increasing need to utilize energy-production strategies that can decrease the burning of fossil fuels. In this context, hydrogen remains an attractive clean-energy fuel that can be oxidized to produce water as a by-product. In spite of being an abundant species, hydrogen is seldom found in a form that is directly usable for energy-production. While steam reforming of methane is one popular technique for hydrogen production, plasma-assisted conversion of biogas (carbon dioxide + methane) to hydrogen is an attractive alternative. Apart from producing hydrogen, the other advantage of using biogas as raw material is the fact that two potent greenhouse gases are consumed. In this regard, modeling is an important tool to understand and optimize plasma-assisted conversion of biogas. The primary goal of this work is to perform a comprehensive statistical study that quantifies the influence of uncertain rate constants thereby determining the key reaction pathways. A 0-D chemical kinetics solver in the OpenFOAM suite is used to perform a series of simulations to propagate the uncertainty in rate constants and the resulting mean and standard deviation of outcomes.

  16. Video-assisted thoracoscopic PlasmaJet ablation for malignant pleural mesothelioma.

    Science.gov (United States)

    Perikleous, Periklis; Asadi, Nizar; Anikin, Vladimir

    2018-01-01

    The role of surgery in malignant pleural mesothelioma (MPM) remains debatable; nonetheless the relative advantages of different surgical approaches are frequently reassessed and reconsidered. While extensive operations and longer recovery periods can be justified for a group of carefully selected patients, many will present at an advanced stage of their disease or with associated co-morbidities which will exclude them from selection criteria for radical treatment. For these patients, minimally invasive video-assisted procedures may be considered, for purposes of cytoreduction and/or symptomatic relief. Even though there is currently not enough clinical evidence to suggest an improvement in overall survival with limited debulking procedures, it has been suggested that they can improve quality of life over drainage and pleurodesis alone. We consider video-assisted PlasmaJet ablation to potentially have a role in mesothelioma surgery, as it may be used for effective cytoreduction while minimising the risk for complications often associated with extensive pleurectomy procedures, and we report on the use of the PlasmaJet Surgical System in our centre for surgical management of a patient with MPM. After demonstrating safety and absence of major adverse events with this approach, we feel justified in offering the procedure to more of our patients as we aim to collect additional data.

  17. Abatement of VOCs with Alternate Adsorption and Plasma-Assisted Regeneration: A Review

    Directory of Open Access Journals (Sweden)

    Sharmin Sultana

    2015-04-01

    Full Text Available Energy consumption is an important concern for the removal of volatile organic compounds (VOCs from waste air with non-thermal plasma (NTP. Although the combination of NTP with heterogeneous catalysis has shown to reduce the formation of unwanted by-products and improve the energy efficiency of the process, further optimization of these hybrid systems is still necessary to evolve to a competitive air purification technology. A newly developed innovative technique, i.e., the cyclic operation of VOC adsorption and NTP-assisted regeneration has attracted growing interest of researchers due to the optimized energy consumption and cost-effectiveness. This paper reviews this new technique for the abatement of VOCs as well as for regeneration of adsorbents. In the first part, a comparison of the energy consumption between sequential and continuous treatment is given. Next, studies dealing with adsorption followed by NTP oxidation are reviewed. Particular attention is paid to the adsorption mechanisms and the regeneration of catalysts with in-plasma and post-plasma processes. Finally, the influence of critical process parameters on the adsorption and regeneration steps is summarized.

  18. Systematic studies of covalent functionalization of carbon nanotubes via argon plasma-assisted UV grafting

    International Nuclear Information System (INIS)

    Yan, Y H; Cui, J; Chan-Park, M B; Wang, X; Wu, Q Y

    2007-01-01

    Single-walled carbon nanotubes (SWNTs) with 1-vinylimidazole species covalently attached to their sidewalls and end caps have been prepared by ultraviolet (UV) irradiation in 1-vinylimidazole monomer. This process can be greatly assisted by argon (Ar) plasma pretreatment, which generates more defect sites at the tube ends and sidewalls acting as the active sites for the subsequent UV grafting of 1-vinylimidazole molecules. The effects of total deposited energy of Ar plasma treatment, either by change of treatment time or discharge power, on the functionalization degree and structural morphology of the resulting nanotubes are systematically studied. By control of the Ar plasma treatment time within 5 min at the discharge power of 200 W, no visible chopping of the functionalized SWNTs was observed. Under this advised optimum processing condition, the functionalization degree, estimated by x-ray photoelectron spectroscopy (XPS) measurement, is as high as around 26 wt% 1-vinylimidazole molecules grafted onto the nanotubes. This method may be extended to other reactive vinyl monomers and offers another diverse way of covalent functionalization of SWNTs

  19. Plasma-assisted co-evaporation of {beta}-indium sulfide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Kosaraju, Sreenivas; Marino, Joseph A.; Harvey, John A.; Wolden, Colin A. [Department of Chemical Engineering, Colorado School of Mines, Golden, CO 80401 (United States)

    2006-05-05

    This paper describes the development of plasma-assisted co-evaporation (PACE) for the formation of {beta}-In{sub 2}S{sub 3} thin films. Indium was supplied by conventional thermal evaporation, while the chalcogen gas precursor (H{sub 2}S) was activated using an inductively coupled plasma (ICP) source. Using a combination of optical emission spectroscopy and mass spectrometry it was shown that the ICP effectively dissociated H{sub 2}S, producing atomic sulfur. Transport modeling was used to quantify the flux distributions of the co-evaporated metal and the plasma-generated species impinging the substrate. Model predictions were validated by measurements of deposition rate and film properties. Substantial improvements in both materials utilization and substrate temperature reduction were realized with respect to conventional co-evaporation. {beta}-In{sub 2}S{sub 3} was formed as low as 100{sup o}C and it was observed that quality was a strong function of S/In ratio. The grain size decreased and the optical band gap increased as the substrate temperature was reduced. (author)

  20. Characterization of a segmented plasma torch assisted High Heat Flux (HHF) system for performance evaluation of plasma facing components in fusion devices

    International Nuclear Information System (INIS)

    Ngangom, Aomoa; Sarmah, Trinayan; Sah, Puspa; Kakati, Mayur; Ghosh, Joydeep

    2015-01-01

    A wide variety of high heat and particle flux test facilities are being used by the fusion community to evaluate the thermal performance of plasma facing materials/components, which includes electron beam, ion beam, neutral beam and thermal plasma assisted sources. In addition to simulate heat loads, plasma sources have the additional advantage of reproducing exact fusion plasma like conditions, in terms of plasma density, temperature and particle flux. At CPP-IPR, Assam, we have developed a high heat and particle flux facility using a DC, non-transferred, segmented thermal plasma torch system, which can produce a constricted, stabilized plasma jet with high ion density. In this system, the plasma torch exhausts into a low pressure chamber containing the materials to be irradiated, which produces an expanded plasma jet with more uniform profiles, compared to plasma torches operated at atmospheric pressure. The heat flux of the plasma beam was studied by using circular calorimeters of different diameters (2 and 3 cm) for different input power (5-55 kW). The effect of the change in gas (argon) flow rate and mixing of gases (argon + hydrogen) was also studied. The heat profile of the plasma beam was also studied by using a pipe calorimeter. From this, the radial heat flux was calculated by using Abel inversion. It is seen that the required heat flux of 10 MW/m 2 is achievable in our system for pure argon plasma as well as for plasma with gas mixtures. The plasma parameters like the temperature, density and the beam velocity were studied by using optical emission spectroscopy. For this, a McPherson made 1.33 meter focal length spectrometer; model number 209, was used. A plane grating with 1800 g/mm was used which gave a spectral resolution of 0.007 nm. A detailed characterization with respect to these plasma parameters for different gas (argon) flow rate and mixing of gases (argon+hydrogen) for different input power will be presented in this paper. The plasma

  1. Frequency effects in silane plasmas for PECVD

    International Nuclear Information System (INIS)

    Howling, A.A.; Dorier, J.L.; Hollenstein, C.; Finger, F.; Kroll, U.

    1991-09-01

    It is generally recognised that the excitation frequency is an important parameter in rf plasma-assisted deposition. VHF silane plasmas (50-100 MHz) have been shown to produce high quality amorphous silicon films up to 20 A/s, and therefore the aim of this work is to compare the VHF range with the 13.56 MHz industrial frequency in the same reactor. The principal diagnostics used are electrical measurements and a CCD camera for spatially-resolved plasma-induced emission with Abel inversion of the plasma image. We present a comparative study of key discharge parameters such as deposition rates, plasma uniformity, ion impact energy, power transfer efficiency and powder formation for the rf range 13-70 MHz. (author) 5 figs., 19 refs

  2. Effect of Mg Doping on the Photoluminescence of GaN:Mg Films by Radio-Frequency Plasma-Assisted Molecular Beam Epitaxy

    International Nuclear Information System (INIS)

    Sui Yan-Ping; Yu Guang-Hui

    2011-01-01

    We investigate undoped GaN and Mg-doped GaN grown by rf plasma-assisted molecular beam epitaxy (MBE) with different Mg concentrations by photoluminescence (PL) at low temperature, Hall-effect and XRD measurements. In the PL spectra of lightly Mg-doped GaN films, a low intensity near band edge (NBE) emission and strong donor-acceptor pair (DAP) emission with its phonon replicas are observed. As the Mg concentration is increased, the DAP and NBE bands become weaker and a red shift of these bands is observed in the PL spectra. Yellow luminescence (YL) is observed in heavily Mg-doped GaN. The x-ray diffraction is employed to study the structure of the films. Hall measurement shows that there is a maximum value (3.9 × 10 18 cm −3 ) of hole concentration with increasing Mg source temperature for compensation effect. PL spectra of undoped GaN are also studied under N-rich and Ga-rich growth conditions. Yellow luminescences of undoped Ga-rich GaN and heavily Mg-doped GaN are compared, indicating the different origins of the YL bands. (condensed matter: electronic structure, electrical, magnetic, and optical properties)

  3. The Study of Al0.29Ga0.71N-BASED Schottky Photodiodes Grown on Silicon by Plasma-Assisted Molecular Beam Epitaxy

    Science.gov (United States)

    Mohd Yusoff, M. Z.; Hassan, Z.; Chin, C. W.; Hassan, H. Abu; Abdullah, M. J.; Mohammad, N. N.; Ahmad, M. A.; Yusof, Y.

    2013-05-01

    In this paper, the growth and characterization of epitaxial Al0.29Ga0.71N grown on Si(111) by RF-plasma assisted molecular beam epitaxy (MBE) are described. The Al mole fraction was derived from the HR-XRD symmetric rocking curve (RC) ω/2θ scans of (0002) plane as x = 0.29. PL spectrum of sample has shown sharp and intense band edge emission of GaN without the existence of yellow emission band, showing that it is comparable in crystal quality of the sample when compared with previous reports. From the Raman measurement of as-grown Al0.29Ga0.71N layer on GaN/AlN/Si sample. We found that the dominant E2 (high) phonon mode of GaN appears at 572.7 cm-1. The E2 (high) mode of AlN appears at 656.7 cm-1 and deviates from the standard value of 655 cm-1 for unstrained AlN. Finally, AlGaN Schottky photodiode have been fabricated and analyzed by mean of electrical characterization, using current-voltage (I-V) measurement to evaluate the performance of this device.

  4. Blue-violet InGaN laser diodes grown on bulk GaN substrates by plasma-assisted molecular-beam epitaxy

    International Nuclear Information System (INIS)

    Skierbiszewski, C.; Wasilewski, Z.R.; Siekacz, M.; Feduniewicz, A.; Perlin, P.; Wisniewski, P.; Borysiuk, J.; Grzegory, I.; Leszczynski, M.; Suski, T.; Porowski, S.

    2005-01-01

    We report on the InGaN multiquantum laser diodes (LDs) made by rf plasma-assisted molecular beam epitaxy (PAMBE). The laser operation at 408 nm is demonstrated at room temperature with pulsed current injections using 50 ns pulses at 0.25% duty cycle. The threshold current density and voltage for the LDs with cleaved uncoated mirrors are 12 kA/cm 2 (900 mA) and 9 V, respectively. High output power of 0.83 W is obtained during pulse operation at 3.6 A and 9.6 V bias with the slope efficiency of 0.35 W/A. The laser structures are deposited on the high-pressure-grown low dislocation bulk GaN substrates taking full advantage of the adlayer enhanced lateral diffusion channel for adatoms below the dynamic metallic cover. Our devices compare very favorably to the early laser diodes fabricated using the metalorganic vapor phase epitaxy technique, providing evidence that the relatively low growth temperatures used in this process pose no intrinsic limitations on the quality of the blue optoelectronic components that can be fabricated using PAMBE

  5. RF sheaths for arbitrary B field angles

    Science.gov (United States)

    D'Ippolito, Daniel; Myra, James

    2014-10-01

    RF sheaths occur in tokamaks when ICRF waves encounter conducting boundaries and accelerate electrons out of the plasma. Sheath effects reduce the efficiency of ICRF heating, cause RF-specific impurity influxes from the edge plasma, and increase the plasma-facing component damage. The rf sheath potential is sensitive to the angle between the B field and the wall, the ion mobility and the ion magnetization. Here, we obtain a numerical solution of the non-neutral rf sheath and magnetic pre-sheath equations (for arbitrary values of these parameters) and attempt to infer the parametric dependences of the Child-Langmuir law. This extends previous work on the magnetized, immobile ion regime. An important question is how the rf sheath voltage distributes itself between sheath and pre-sheath for various B field angles. This will show how generally previous estimates of the rf sheath voltage and capacitance were reasonable, and to improve the RF sheath BC. Work supported by US DOE grants DE-FC02-05ER54823 and DE-FG02-97ER54392.

  6. Plasma-assisted ALD for the conformal deposition of SiO2 : process, material and electronic properties

    NARCIS (Netherlands)

    Dingemans, G.; Helvoirt, van C.A.A.; Pierreux, D.; Keuning, W.; Kessels, W.M.M.

    2012-01-01

    Plasma-assisted atomic layer deposition (ALD) was used to deposit SiO2 films in the temperature range of Tdep = 50–400°C on Si(100). H2Si[N(C2H5)2]2 and an O2 plasma were used as Si precursor and oxidant, respectively. The ALD growth process and material properties were characterized in detail.

  7. Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

    NARCIS (Netherlands)

    Langereis, E.; Keijmel, J.; Sanden, van de M.C.M.; Kessels, W.M.M.

    2008-01-01

    The surface groups created during plasma-assisted atomic layer deposition (ALD) of Al2O3 were studied by infrared spectroscopy. For temperatures in the range of 25–150 °C, –CH3 and –OH were unveiled as dominant surface groups after the Al(CH3)3precursor and O2 plasma half-cycles, respectively. At

  8. DOE planning workshop on rf theory and computations

    International Nuclear Information System (INIS)

    1984-01-01

    The purpose of the two-day workshop-meeting was to review the status of rf heating in magnetic fusion plasmas and to determine the outstanding problems in this area. The term rf heating was understood to encompass not only bulk plasma heating by externally applied electromagnetic power but also current generation in toroidal plasmas and generation of thermal barriers in tandem mirror plasmas

  9. Cyan laser diode grown by plasma-assisted molecular beam epitaxy

    International Nuclear Information System (INIS)

    Turski, H.; Muziol, G.; Wolny, P.; Cywiński, G.; Grzanka, S.; Sawicka, M.; Perlin, P.; Skierbiszewski, C.

    2014-01-01

    We demonstrate AlGaN-cladding-free laser diodes (LDs), operating in continuous wave (CW) mode at 482 nm grown by plasma-assisted molecular beam epitaxy (PAMBE). The maximum CW output power was 230 mW. LDs were grown on c-plane GaN substrates obtained by hydride vapor phase epitaxy. The PAMBE process was carried out in metal-rich conditions, supplying high nitrogen flux (Φ N ) during quantum wells (QWs) growth. We found that high Φ N improves quality of high In content InGaN QWs. The role of nitrogen in the growth of InGaN on (0001) GaN surface as well as the influence of LDs design on threshold current density are discussed

  10. Low temperature metal free growth of graphene on insulating substrates by plasma assisted chemical vapor deposition

    Science.gov (United States)

    Muñoz, R.; Munuera, C.; Martínez, J. I.; Azpeitia, J.; Gómez-Aleixandre, C.; García-Hernández, M.

    2017-03-01

    Direct growth of graphene films on dielectric substrates (quartz and silica) is reported, by means of remote electron cyclotron resonance plasma assisted chemical vapor deposition r-(ECR-CVD) at low temperature (650 °C). Using a two step deposition process- nucleation and growth- by changing the partial pressure of the gas precursors at constant temperature, mostly monolayer continuous films, with grain sizes up to 500 nm are grown, exhibiting transmittance larger than 92% and sheet resistance as low as 900 Ω sq-1. The grain size and nucleation density of the resulting graphene sheets can be controlled varying the deposition time and pressure. In additon, first-principles DFT-based calculations have been carried out in order to rationalize the oxygen reduction in the quartz surface experimentally observed. This method is easily scalable and avoids damaging and expensive transfer steps of graphene films, improving compatibility with current fabrication technologies.

  11. Water-assisted growth of graphene-carbon nanotube hybrids in plasma

    Science.gov (United States)

    Tewari, Aarti; Ghosh, Santanu; Srivastava, Pankaj

    2018-04-01

    The enhanced growth of graphene-carbon nanotube (CNT) hybrids in a hydrocarbon and hydrogen plasma assisted by water is numerically formulated. The catalyst activity and agglomeration of catalyst particles are the rate determining factors in the growth of hybrids and their constituents, i.e., the CNT and graphene. The water vapor concentration is varied to investigate its effect on the growth process. The enhanced catalyst activity on account of oxidation by hydroxyl ions of water to impede the agglomeration of catalyst particles and the removal of amorphous carbon through etching by hydrogen ions of water are seen to be the main driving forces behind the many fold increase in the dimensions of constituent nanostructures and the hybrids with water vapor concentration. Importantly, beyond a certain specific water vapor concentration, the growth rates dropped due to active oxidation of the catalyst particle.

  12. Plasma pro-atrial natriuretic peptide to estimate fluid balance during open and robot-assisted esophagectomy

    DEFF Research Database (Denmark)

    Strandby, Rune Broni; Ambrus, Rikard; Secher, Niels H

    2017-01-01

    BACKGROUND: It remains debated how much fluid should be administered during surgery. The atrial natriuretic peptide precursor proANP is released by atrial distension and deviations in plasma proANP are reported associated with perioperative fluid balance. We hypothesized that plasma proANP would...... decrease when the central blood volume is compromised during the abdominal part of robot-assisted hybrid (RE) esophagectomy and that a positive fluid balance would be required to maintain plasma proANP. METHODS: Patients undergoing RE (n = 25) or open (OE; n = 25) esophagectomy for gastroesophageal cancer...

  13. RF torch discharge combined with conventional burner

    International Nuclear Information System (INIS)

    Janca, J.; Tesar, C.

    1996-01-01

    The design of the combined flame-rf-plasma reactor and experimental examination of this reactor are presented. For the determination of the temperature in different parts of the combined burner plasma the methods of emission spectroscopy were used. The temperatures measured in the conventional burner reach the maximum temperature 1900 K but in the burner with the superimposed rf discharge the neutral gas temperature substantially increased up to 2600 K but also the plasma volume increases substantially. Consequently, the resident time of reactants in the reaction zone increases

  14. Simulations of planar non-thermal plasma assisted ignition at atmospheric pressure

    KAUST Repository

    Casey, Tiernan A.

    2016-10-21

    The opportunity for ignition assistance by a pulsed applied voltage is investigated in a canonical one-dimensional configuration. An incipient ignition kernel, formed by localized energy deposition into a lean mixture of methane and air at atmospheric pressure, is subjected to sub-breakdown electric fields (E/N ≈ 100 Td) by a DC potential applied across the domain, resulting in non-thermal behavior of the plasma formed during the discharge. A two-fluid approach is employed to couple thermal neutrals and ions to the non-thermal electrons. A two-temperature plasma mechanism describing gas phase combustion, excitation of neutral species, and high-energy electron kinetics is employed to account for non-thermal effects. Charged species transported from the ignition zone drift rapidly through the domain, augmenting the magnitude of the electric field in the fresh gas during the pulse through a dynamic-electrode effect, which results in an increase in the energy of the electrons in the fresh mixture with increasing time. Enhanced fuel and oxidizer decomposition due to electron impact dissociation and interaction with excited neutrals generate a pool of radicals, mostly O and H, in the fresh gas ahead of the flame\\'s preheat zone. In the configuration considered, the effect of the nanosecond pulse is to increase the mass of fuel burned at equivalent times relative to the unsupported ignition through enhanced radical generation, resulting in an increased heat release rate in the immediate aftermath of the pulse.

  15. Plasma assisted nitriding for micro-texturing onto martensitic stainless steels*

    Directory of Open Access Journals (Sweden)

    Katoh Takahisa

    2015-01-01

    Full Text Available Micro-texturing method has grown up to be one of the most promising procedures to form micro-lines, micro-dots and micro-grooves onto the mold-die materials and to duplicate these micro-patterns onto metallic or polymer sheets via stamping or injection molding. This related application requires for large-area, fine micro-texturing onto the martensitic stainless steel mold-die materials. A new method other than laser-machining, micro-milling or micro-EDM is awaited for further advancement of this micro-texturing. In the present paper, a new micro-texturing method is developed on the basis of the plasma assisted nitriding to transform the two-dimensionally designed micro-patterns to the three dimensional micro-textures in the martensitic stainless steels. First, original patterns are printed onto the surface of stainless steel molds by using the dispenser or the ink-jet printer. Then, the masked mold is subjected to high density plasma nitriding; the un-masked surfaces are nitrided to have higher hardness, 1400 Hv than the matrix hardness, 200 Hv of stainless steels. This nitrided mold is further treated by sand-blasting to selectively remove the soft, masked surfaces. Finally, the micro-patterned martensitic stainless steel mold is fabricated as a tool to duplicate these micro-patterns onto the plastic materials by the injection molding.

  16. Start-up assist by magnetized plasma flow injection in TPE-RX reversed-field pinch

    Energy Technology Data Exchange (ETDEWEB)

    Asai, T. [College of Science and Technology, Nihon University, 1-8 Kanda-Surugadai, Chiyoda-ku, Tokyo 101-8308 (Japan)]. E-mail: asai@phys.cst.nihon-u.ac.jp; Nagata, M. [Graduate School of Engineering, University of Hyogo, Himeji (Japan); Koguchi, H. [National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba (Japan); Hirano, Y. [National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba (Japan); Sakakita, H. [National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba (Japan); Yambe, K. [National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba (Japan); Kiyama, S. [National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba (Japan)

    2006-11-15

    A reversed-field pinch (RFP) start-up assisted by a magnetized plasma flow injection was demonstrated for the first time on a TPE-RX machine. This sequence of experiments aimed to establish a new method of ionization, gas-fill and helicity injection in the start-up phase of an RFP. In this start-up method, magnetized and well-ionized plasma is formed by a magnetized coaxial plasma gun and injected into the torus chamber as an initial pre-ionized plasma for RFP formation. In the initial experiments, attenuated density pump-out and comparatively slow decay of the toroidal flux and plasma current were observed as evidence of its being an effective start-up method.

  17. Investigating the Plasma-Assisted and Thermal Catalytic Dry Methane Reforming for Syngas Production: Process Design, Simulation and Evaluation

    Directory of Open Access Journals (Sweden)

    Evangelos Delikonstantis

    2017-09-01

    Full Text Available The growing surplus of green electricity generated by renewable energy technologies has fueled research towards chemical industry electrification. By adapting power-to-chemical concepts, such as plasma-assisted processes, cheap resources could be converted into fuels and base chemicals. However, the feasibility of those electrified processes at large scale has not been investigated yet. Thus, the current work strives to compare, for first time in the literature, plasma-assisted production of syngas, from CH4 and CO2 (dry methane reforming, with thermal catalytic dry methane reforming. Specifically, both processes are conceptually designed to deliver syngas suitable for methanol synthesis (H2/CO ≥ 2 in mole. The processes are simulated in the Aspen Plus process simulator where different process steps are investigated. Heat integration and equipment cost estimation are performed for the most promising process flow diagrams. Collectively, plasma-assisted dry methane reforming integrated with combined steam/CO2 methane reforming is an effective way to deliver syngas for methanol production. It is more sustainable than combined thermal catalytic dry methane reforming with steam methane reforming, which has also been proposed for syngas production of H2/CO ≥ 2; in the former process, 40% more CO2 is captured, while 38% less H2O is consumed per mol of syngas. Furthermore, the plasma-assisted process is less complex than the thermal catalytic one; it requires higher amount of utilities, but comparable capital investment.

  18. Plasma-assisted synthesis of monodispersed and robust Ruthenium ultrafine nanocatalysts for organosilane oxidation and oxygen evolution reactions

    NARCIS (Netherlands)

    Gnanakumar, E.S.; Ng, W.; Filiz, B.C.; Rothenberg, G.; Wang, S.; Xu, H.; Pastor-Pérez, L.; Pastor-Blas, M.M.; Sepúlveda-Escribano, A.; Yan, N.; Shiju, N.R.

    2017-01-01

    We report a facile and general approach for preparing ultrafine ruthenium nanocatalysts by using a plasma-assisted synthesis at <100 °C. The resulting Ru nanoparticles are monodispersed (typical size 2 nm) and remain that way upon loading onto carbon and TiO2 supports. This gives robust catalysts

  19. Remote plasma-assisted nitridation (RPN): applications to Zr and Hf silicate alloys and Al2O3

    International Nuclear Information System (INIS)

    Hinkle, Chris; Lucovsky, Gerry

    2003-01-01

    Remote plasma-assisted nitridation or RPN is demonstrated to be a processing pathway for nitridation of Zr and Hf silicate alloys, and for Al 2 O 3 , as well. The dependence of nitrogen incorporation on the process pressure is qualitatively similar to what has been reported for the plasma-assisted nitridation of SiO 2 , the lower the process pressure the greater the nitrogen incorporation in the film. The increased incorporation of nitrogen has been correlated with the penetration of the plasma-glow into the process chamber, and the accompanying increase in the concentration of N 2 + ions that participate in the reactions leading to bulk incorporation. The nitrogen incorporation as been studied by Auger electron spectroscopy (AES), secondary ion mass spectrometry (SIMS) and X-ray absorption spectroscopy (XAS)

  20. Hydrogen plasma enhanced alignment on CNT-STM tips grown by liquid catalyst-assisted microwave plasma-enhanced chemical vapor deposition

    International Nuclear Information System (INIS)

    Tung, Fa-Kuei; Yoshimura, Masamichi; Ueda, Kazuyuki; Ohira, Yutaka; Tanji, Takayoshi

    2008-01-01

    Carbon nanotubes are grown directly on a scanning tunneling microscopy tip by liquid catalyst-assisted microwave-enhanced chemical vapor deposition, and effects of hydrogen plasma treatment on the tip have been investigated in detail by field-emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM) and Raman spectroscopy. The unaligned CNTs on the as-grown tip apex have been realigned and reshaped by subsequent hydrogen plasma treatment. The diameter of CNTs is enlarged mainly due to amorphous layers being re-sputtered over their outer shells

  1. Design of resonant converter based DC power supply for RF amplifier

    International Nuclear Information System (INIS)

    Mohan, Kartik; Suthar, Gajendra; Dalicha, Hrushikesh; Agarwal, Rohit; Trivedi, R.G.; Mukherjee, Aparajita

    2017-01-01

    ITER require 20 MW of RF power to a large variety of plasmas in the Ion Cyclotron frequency range for heating and driving plasma current. Nine RF sources of 2.5MW RF power level each collectively will accomplish the above requirement. Each RF source consists of SSPA, driver and end stage, above which driver and end stage amplifier are tube (Tetrode/Diacrode) based which requires auxiliary DC power source viz. filament, screen grid and control grid DC power supply. DC power supply has some stringent requirements like low stored energy, fast turn off, and low ripple value, etc. This paper will focus only on Zero Current Switching (ZCS) resonant converter based buck converter. This can serve the purpose of control grid and screen grid DC power supply for above requirement. IGBT switch will be used at 20 kHz so as to lower the filter requirement hence low stored energy and ripple in the output voltage. ZCS operation will also assist us in reducing EMI/EMC effect. Design of resonant tank circuit is important aspect of the converter as it forms the backbone of the complete system and basis of selection of other important parameters as well hence mathematical model analysis with the help of circuit equations for various modes have been shown as a part of selection criteria. Peak current through the switch, duty cycle, switching frequency will be the design parameters for selecting resonant tank circuit

  2. Comparative Shock-Tube Study of Autoignition and Plasma-Assisted Ignition of C2-Hydrocarbons

    Science.gov (United States)

    Kosarev, Ilya; Kindysheva, Svetlana; Plastinin, Eugeny; Aleksandrov, Nikolay; Starikovskiy, Andrey

    2015-09-01

    The dynamics of pulsed picosecond and nanosecond discharge development in liquid water, ethanol and hexane Using a shock tube with a discharge cell, ignition delay time was measured in a lean (φ = 0.5) C2H6:O2:Ar mixture and in lean (φ = 0.5) and stoichiometric C2H4:O2:Ar mixtures with a high-voltage nanosecond discharge and without it. The measured results were compared with the measurements made previously with the same setup for C2H6-, C2H5OH- and C2H2-containing mixtures. It was shown that the effect of plasma on ignition is almost the same for C2H6, C2H4 and C2H5OH. The reduction in time is smaller for C2H2, the fuel that is well ignited even without the discharge. Autoignition delay time was independent of the stoichiometric ratio for C2H6 and C2H4, whereas this time in stoichiometric C2H2- and C2H5OH-containing mixtures was noticeably shorter than that in the lean mixtures. Ignition after the discharge was not affected by a change in the stoichiometric ratio for C2H2 and C2H4, whereas the plasma-assisted ignition delay time for C2H6 and C2H5OH decreased as the equivalence ratio changed from 1 to 0.5. Ignition delay time was calculated in C2-hydrocarbon-containing mixtures under study by simulating separately discharge and ignition processes. Good agreement was obtained between new measurements and calculated ignition delay times.

  3. Characterization and modelling of microwave multi dipole plasmas. Application to multi dipolar plasma assisted sputtering; Caracterization et modelisation des plasmas micro-onde multi-dipolaires. Application a la pulverisation assistee par plasma multi-dipolaire

    Energy Technology Data Exchange (ETDEWEB)

    Tran, Tan Vinh [Universite Joseph Fourier/CNRS-IN2P3, 53 Avenue des Martyrs, F-38026 Grenoble (France)

    2006-07-01

    the magnet has also shown a better radial confinement with magnets exhibiting high length over diameter ratios. In addition, the numerical study corroborates the results of the experimental study, i.e. an ECR coupling region close to the equatorial plane of the magnet and not near the end of the coaxial microwave line. Finally, these results have been successfully applied to plasma assisted sputtering of targets allowing, in particular, their uniform erosion. (author)

  4. RF study and 3-D simulations of a side-coupling thermionic RF-gun

    International Nuclear Information System (INIS)

    Rimjaem, S.; Kusoljariyakul, K.; Thongbai, C.

    2014-01-01

    A thermionic RF-gun for generating ultra-short electron bunches was optimized, developed and used as a source at a linac-based THz radiation research laboratory of the Plasma and Beam Physics Research Facility, Chiang Mai University, Thailand. The RF-gun is a π/2-mode standing wave structure, which consists of two S-band accelerating cells and a side-coupling cavity. The 2856 MHz RF wave is supplied from an S-band klystron to the gun through the waveguide input-port at the cylindrical wall of the second cell. A fraction of the RF power is coupled from the second cell to the first one via a side-coupling cavity. Both the waveguide input-port and the side-coupling cavity lead to an asymmetric geometry of the gun. RF properties and electromagnetic field distributions inside the RF-gun were studied and numerically simulated by using computer codes SUPERFISH 7.19 and CST Microwave Studio 2012 © . RF characterizations and tunings of the RF-gun were performed to ensure the reliability of the gun operation. The results from 3D simulations and measurements are compared and discussed in this paper. The influence of asymmetric field distributions inside the RF-gun on the electron beam properties was investigated via 3D beam dynamics simulations. A change in the coupling-plane of the side-coupling cavity is suggested to improve the gun performance

  5. RF study and 3-D simulations of a side-coupling thermionic RF-gun

    Energy Technology Data Exchange (ETDEWEB)

    Rimjaem, S., E-mail: sakhorn.rimjaem@cmu.ac.th [Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Thailand Center of Excellence in Physics (ThEP), Commission on Higher Education, Bangkok 10400 (Thailand); Kusoljariyakul, K.; Thongbai, C. [Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Thailand Center of Excellence in Physics (ThEP), Commission on Higher Education, Bangkok 10400 (Thailand)

    2014-02-01

    A thermionic RF-gun for generating ultra-short electron bunches was optimized, developed and used as a source at a linac-based THz radiation research laboratory of the Plasma and Beam Physics Research Facility, Chiang Mai University, Thailand. The RF-gun is a π/2-mode standing wave structure, which consists of two S-band accelerating cells and a side-coupling cavity. The 2856 MHz RF wave is supplied from an S-band klystron to the gun through the waveguide input-port at the cylindrical wall of the second cell. A fraction of the RF power is coupled from the second cell to the first one via a side-coupling cavity. Both the waveguide input-port and the side-coupling cavity lead to an asymmetric geometry of the gun. RF properties and electromagnetic field distributions inside the RF-gun were studied and numerically simulated by using computer codes SUPERFISH 7.19 and CST Microwave Studio 2012{sup ©}. RF characterizations and tunings of the RF-gun were performed to ensure the reliability of the gun operation. The results from 3D simulations and measurements are compared and discussed in this paper. The influence of asymmetric field distributions inside the RF-gun on the electron beam properties was investigated via 3D beam dynamics simulations. A change in the coupling-plane of the side-coupling cavity is suggested to improve the gun performance.

  6. RF study and 3-D simulations of a side-coupling thermionic RF-gun

    Science.gov (United States)

    Rimjaem, S.; Kusoljariyakul, K.; Thongbai, C.

    2014-02-01

    A thermionic RF-gun for generating ultra-short electron bunches was optimized, developed and used as a source at a linac-based THz radiation research laboratory of the Plasma and Beam Physics Research Facility, Chiang Mai University, Thailand. The RF-gun is a π/2-mode standing wave structure, which consists of two S-band accelerating cells and a side-coupling cavity. The 2856 MHz RF wave is supplied from an S-band klystron to the gun through the waveguide input-port at the cylindrical wall of the second cell. A fraction of the RF power is coupled from the second cell to the first one via a side-coupling cavity. Both the waveguide input-port and the side-coupling cavity lead to an asymmetric geometry of the gun. RF properties and electromagnetic field distributions inside the RF-gun were studied and numerically simulated by using computer codes SUPERFISH 7.19 and CST Microwave Studio 2012©. RF characterizations and tunings of the RF-gun were performed to ensure the reliability of the gun operation. The results from 3D simulations and measurements are compared and discussed in this paper. The influence of asymmetric field distributions inside the RF-gun on the electron beam properties was investigated via 3D beam dynamics simulations. A change in the coupling-plane of the side-coupling cavity is suggested to improve the gun performance.

  7. One-dimensional analysis of the rate of plasma-assisted sputter deposition

    International Nuclear Information System (INIS)

    Palmero, A.; Rudolph, H.; Habraken, F. H. P. M.

    2007-01-01

    In this article a recently developed model [A. Palmero, H. Rudolph, and F. H. P. M. Habraken, Appl. Phys. Lett. 89, 211501 (2006)] is applied to analyze the transport of sputtered material from the cathode toward the growing film when using a plasma-assisted sputtering deposition technique. The argon pressure dependence of the deposition rate of aluminum, silicon, vanadium, chromium, germanium, tantalum, and tungsten under several different experimental conditions has been analyzed by fitting experimental results from the literature to the above-mentioned theory. Good fits are obtained. Three quantities are deduced from the fit: the temperature of the cathode and of the growing film, and the value of the effective cross section for thermalization due to elastic scattering of a sputtered particle on background gas atoms. The values derived from the fits for the growing film and cathode temperature are very similar to those experimentally determined and reported in the literature. The effective cross sections have been found to be approximately the corresponding geometrical cross section divided by the average number of collisions required for the thermalization, implying that the real and effective thermalization lengths have a similar value. Finally, the values of the throw distance appearing in the Keller-Simmons model, as well as its dependence on the deposition conditions have been understood invoking the values of the cathode and film temperature, as well as of the value of the effective cross section. The analysis shows the overall validity of this model for the transport of sputtered particles in sputter deposition

  8. Microwave plasma-assisted chemical vapor deposition of porous carbon film as supercapacitive electrodes

    Science.gov (United States)

    Wu, Ai-Min; Feng, Chen-Chen; Huang, Hao; Paredes Camacho, Ramon Alberto; Gao, Song; Lei, Ming-Kai; Cao, Guo-Zhong

    2017-07-01

    Highly porous carbon film (PCF) coated on nickel foam was prepared successfully by microwave plasma-assisted chemical vapor deposition (MPCVD) with C2H2 as carbon source and Ar as discharge gas. The PCF is uniform and dense with 3D-crosslinked nanoscale network structure possessing high degree of graphitization. When used as the electrode material in an electrochemical supercapacitor, the PCF samples verify their advantageous electrical conductivity, ion contact and electrochemical stability. The test results show that the sample prepared under 1000 W microwave power has good electrochemical performance. It displays the specific capacitance of 62.75 F/g at the current density of 2.0 A/g and retains 95% of its capacitance after 10,000 cycles at the current density of 2.0 A/g. Besides, its near-rectangular shape of the cyclic voltammograms (CV) curves exhibits typical character of an electric double-layer capacitor, which owns an enhanced ionic diffusion that can fit the requirements for energy storage applications.

  9. Temperature measurement of plasma-assisted flames: comparison between optical emission spectroscopy and 2-color laser induced fluorescence techniques

    KAUST Repository

    Lacoste, Deanna A.

    2015-03-30

    Accurate thermometry of highly reactive environments, such as plasma-assisted combustion, is challenging. With the help of conical laminar premixed methane-air flames, this study compares two thermometry techniques for the temperature determination in a combustion front enhanced by nanosecond repetitively pulsed (NRP) plasma discharges. Based on emission spectroscopic analysis, the results show that the rotational temperature of CH(A) gives a reasonable estimate for the adiabatic flame temperature, only for lean and stoichiometric conditions. The rotational temperature of N2(C) is found to significantly underestimate the flame temperature. The 2-color OH-PLIF technique gives correct values of the flame temperature.

  10. Temperature measurement of plasma-assisted flames: comparison between optical emission spectroscopy and 2-color laser induced fluorescence techniques

    KAUST Repository

    Lacoste, Deanna A.; Heitz, Sylvain A.; Moeck, Jonas P.

    2015-01-01

    Accurate thermometry of highly reactive environments, such as plasma-assisted combustion, is challenging. With the help of conical laminar premixed methane-air flames, this study compares two thermometry techniques for the temperature determination in a combustion front enhanced by nanosecond repetitively pulsed (NRP) plasma discharges. Based on emission spectroscopic analysis, the results show that the rotational temperature of CH(A) gives a reasonable estimate for the adiabatic flame temperature, only for lean and stoichiometric conditions. The rotational temperature of N2(C) is found to significantly underestimate the flame temperature. The 2-color OH-PLIF technique gives correct values of the flame temperature.

  11. rf driven multicusp H- ion source

    International Nuclear Information System (INIS)

    Leung, K.N.; DeVries, G.J.; DiVergilio, W.F.; Hamm, R.W.; Hauck, C.A.; Kunkel, W.B.; McDonald, D.S.; Williams, M.D.

    1991-01-01

    An rf driven multicusp source capable of generating 1-ms H - beam pulses with a repetition rate as high as 150 Hz has been developed. This source can be operated with a filament or other types of starter. There is almost no lifetime limitation and a clean plasma can be maintained for a long period of operation. It is demonstrated that rf power as high as 25 kW could be coupled inductively to the plasma via a glass-coated copper-coil antenna. The extracted H - current density achieved is about 200 mA/cm 2

  12. Impact of self-assembled monolayer assisted surface dipole modulation of PET substrate on the quality of RF-sputtered AZO film

    Energy Technology Data Exchange (ETDEWEB)

    Vo, Thieu Thi Tien [Department of Chemical Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan (China); Faculty of Chemical Engineering and Food Technology, Ba Ria-Vung Tau University, Vung Tau (Viet Nam); Mahesh, K.P.O. [Department of Chemical Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan (China); Lin, Pao-Hung [Department of Electronic and Computer Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan (China); Tai, Yian, E-mail: ytai@mail.ntust.edu.tw [Department of Chemical Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan (China)

    2017-05-01

    Highlights: • We use SAMs functionalizing the PET substrates to generate different surface dipoles. • We deposited AZO film on pristine and SAMs-modified PET substrate. • The positive dipole moment of PET surface promotes the crystallinity of AZO film. • The negative dipole moment of PET surface deteriorates the crystallinity of AZO film. • The electrical properties of AZO/PET changes upon the variation of the crystallinity. - Abstract: In this study, we fabricated the electron donating/withdrawing group functionalized organosilane self-assembled monolayers (SAMs) on transparent polyethylene terephthalate (PET) flexible substrate followed by the deposition of aluminum doped zinc oxide (AZO) using RF magnetron sputtering at room temperature. The effect of different SAMs on transparent PET substrates and AZO films were studied by contact angle (CA), X-ray photoelectron spectroscopy (XPS), Atomic force microscopy (AFM), X-ray diffraction (XRD), Field-Emission scanning electron microscope (FE-SEM), Hall measurement and UV–vis spectroscopy (UV–vis). The results presented that the surface dipole (i.e. electron-donating/withdrawing) of different SAMs functionalized PET substrates affected the quality of the AZO films which deposited on top of them. The crystallinity, the charge mobility, and the carrier concentration of the AZO improved when the film was deposited on the PET functionalized with electron donating group, which was possibly due to favored interaction between electron donating group and Al ions.

  13. Impact of self-assembled monolayer assisted surface dipole modulation of PET substrate on the quality of RF-sputtered AZO film

    International Nuclear Information System (INIS)

    Vo, Thieu Thi Tien; Mahesh, K.P.O.; Lin, Pao-Hung; Tai, Yian

    2017-01-01

    Highlights: • We use SAMs functionalizing the PET substrates to generate different surface dipoles. • We deposited AZO film on pristine and SAMs-modified PET substrate. • The positive dipole moment of PET surface promotes the crystallinity of AZO film. • The negative dipole moment of PET surface deteriorates the crystallinity of AZO film. • The electrical properties of AZO/PET changes upon the variation of the crystallinity. - Abstract: In this study, we fabricated the electron donating/withdrawing group functionalized organosilane self-assembled monolayers (SAMs) on transparent polyethylene terephthalate (PET) flexible substrate followed by the deposition of aluminum doped zinc oxide (AZO) using RF magnetron sputtering at room temperature. The effect of different SAMs on transparent PET substrates and AZO films were studied by contact angle (CA), X-ray photoelectron spectroscopy (XPS), Atomic force microscopy (AFM), X-ray diffraction (XRD), Field-Emission scanning electron microscope (FE-SEM), Hall measurement and UV–vis spectroscopy (UV–vis). The results presented that the surface dipole (i.e. electron-donating/withdrawing) of different SAMs functionalized PET substrates affected the quality of the AZO films which deposited on top of them. The crystallinity, the charge mobility, and the carrier concentration of the AZO improved when the film was deposited on the PET functionalized with electron donating group, which was possibly due to favored interaction between electron donating group and Al ions.

  14. Workshop on Molecule Assisted Recombination and Other Processes in Fusion Divertor Plasmas, September 8-9, 2000

    International Nuclear Information System (INIS)

    Janev, R.K.; Schultz, D.R.

    2000-01-01

    A brief proceedings of the two-day Workshop on Molecule Assisted Recombination and Other Processes in Fusion Divertor Plasmas, organized by the ORNL Controlled Fusion Atomic Data Center on September 8-9, 2000, is presented. The conclusions and recommendations of the workshop regarding the topics discussed and the collaboration of the U.S. fusion research and atomic physics communities are also summarized

  15. Modeling of electron behaviors under microwave electric field in methane and air pre-mixture gas plasma assisted combustion

    Science.gov (United States)

    Akashi, Haruaki; Sasaki, K.; Yoshinaga, T.

    2011-10-01

    Recently, plasma-assisted combustion has been focused on for achieving more efficient combustion way of fossil fuels, reducing pollutants and so on. Shinohara et al has reported that the flame length of methane and air premixed burner shortened by irradiating microwave power without increase of gas temperature. This suggests that electrons heated by microwave electric field assist the combustion. They also measured emission from 2nd Positive Band System (2nd PBS) of nitrogen during the irradiation. To clarify this mechanism, electron behavior under microwave power should be examined. To obtain electron transport parameters, electron Monte Carlo simulations in methane and air mixture gas have been done. A simple model has been developed to simulate inside the flame. To make this model simple, some assumptions are made. The electrons diffuse from the combustion plasma region. And the electrons quickly reach their equilibrium state. And it is found that the simulated emission from 2nd PBS agrees with the experimental result. Recently, plasma-assisted combustion has been focused on for achieving more efficient combustion way of fossil fuels, reducing pollutants and so on. Shinohara et al has reported that the flame length of methane and air premixed burner shortened by irradiating microwave power without increase of gas temperature. This suggests that electrons heated by microwave electric field assist the combustion. They also measured emission from 2nd Positive Band System (2nd PBS) of nitrogen during the irradiation. To clarify this mechanism, electron behavior under microwave power should be examined. To obtain electron transport parameters, electron Monte Carlo simulations in methane and air mixture gas have been done. A simple model has been developed to simulate inside the flame. To make this model simple, some assumptions are made. The electrons diffuse from the combustion plasma region. And the electrons quickly reach their equilibrium state. And it is found

  16. Plasma-Assisted ALD TiN/Al2O3 stacks for MIMIM Trench Capacitor Applications

    NARCIS (Netherlands)

    Hoogeland, D.; Jinesh, K.B.; Voogt, F.C.; Besling, W.F.A.; Lamy, Y.; Roozeboom, F.; Sanden, van de M.C.M.; Kessels, W.M.M.; Gendt, de S.

    2009-01-01

    In this paper we report on the overall plasma-assisted ALD processes of Al2O3 and TiN conducted in a single reactor chamber and at a single temperature (340 oC). The individual Al2O3 and TiN films in the stack were consecutively deposited in such a way that they were separated by purge intervals

  17. Plasma-assisted ohmic contact for AlGaN/GaN heterostructure field-effect transistors

    International Nuclear Information System (INIS)

    Zhang, Jiaqi; Wang, Lei; Wang, Qingpeng; Jiang, Ying; Li, Liuan; Ao, Jin-Ping; Zhu, Huichao

    2016-01-01

    An Al-based ohmic process assisted by an inductively coupled plasma (ICP) recess treatment is proposed for AlGaN/GaN heterostructure field-effect transistors (HFETs) to realize ohmic contact, which is only needed to anneal at 500 °C. The recess treatment was done with SiCl 4 plasma with 100 W ICP power for 20 s and annealing at 575 °C for 1 min. Under these conditions, contact resistance of 0.52 Ωmm was confirmed. To suppress the ball-up phenomenon and improve the surface morphology, an Al/TiN structure was also fabricated with the same conditions. The contact resistance was further improved to 0.30 Ωmm. By using this plasma-assisted ohmic process, a gate-first HFET was fabricated. The device showed high drain current density and high transconductance. The leakage current of the TiN-gate device decreased to 10 −9 A, which was 5 orders of magnitude lower than that of the device annealed at 800 °C. The results showed that the low-temperature ohmic contact process assisted by ICP treatment is promising for the fabrication of gate-first and self-aligned gate HFETs. (paper)

  18. Photon-assisted Beam Probes for Low Temperature Plasmas and Installation of Neutral Beam Probe in Helimak

    Science.gov (United States)

    Garcia de Gorordo, Alvaro; Hallock, Gary A.; Kandadai, Nirmala

    2008-11-01

    The Heavy Ion Beam Probe (HIBP) diagnostic has successfully measured the electric potential in a number of major plasma devices in the fusion community. In contrast to a Langmuir probe, the HIBP measures the exact electric potential rather than the floating potential. It is also has the advantage of being a very nonperturbing diagnostic. We propose a new photon-assisted beam probe technique that would extend the HIBP type of diagnostics into the low temperature plasma regime. We expect this method to probe plasmas colder than 10 eV. The novelty of the proposed diagnostic is a VUV laser that ionizes the probing particle. Excimer lasers produce the pulsed VUV radiation needed. The lasers on the market don't have a short enough wavelength too ionize any ion directly and so we calculate the population density of excited states in a NLTE plasma. These new photo-ionization techniques can take an instantaneous one-dimensional potential measurement of a plasma and are ideal for nonmagnitized plasmas where continuous time resolution is not required. Also the status of the Neutral Beam Probe installation on the Helimak experiment will be presented.

  19. Formation of Apatite Coatings on an Artificial Ligament Using a Plasma- and Precursor-Assisted Biomimetic Process

    Directory of Open Access Journals (Sweden)

    Ayako Oyane

    2013-09-01

    Full Text Available A plasma- and precursor-assisted biomimetic process utilizing plasma and alternate dipping treatments was applied to a Leed-Keio artificial ligament to produce a thin coating of apatite in a supersaturated calcium phosphate solution. Following plasma surface modification, the specimen was alternately dipped in calcium and phosphate ion solutions three times (alternate dipping treatment to create a precoating containing amorphous calcium phosphate (ACP which is an apatite precursor. To grow an apatite layer on the ACP precoating, the ACP-precoated specimen was immersed for 24 h in a simulated body fluid with ion concentrations approximately equal to those in human blood plasma. The plasma surface modification was necessary to create an adequate apatite coating and to improve the coating adhesion depending on the plasma power density. The apatite coating prepared using the optimized conditions formed a thin-film that covered the entire surface of the artificial ligament. The resulting apatite-coated artificial ligament should exhibit improved osseointegration within the bone tunnel and possesses great potential for use in ligament reconstructions.

  20. Plasma-Assisted Synthesis of NiCoP for Efficient Overall Water Splitting

    KAUST Repository

    Liang, Hanfeng

    2016-11-09

    Efficient water splitting requires highly active, earth-abundant, and robust catalysts. Monometallic phosphides such as NiP have been shown to be active toward water splitting. Our theoretical analysis has suggested that their performance can be further enhanced by substitution with extrinsic metals, though very little work has been conducted in this area. Here we present for the first time a novel PH plasma-assisted approach to convert NiCo hydroxides into ternary NiCoP. The obtained NiCoP nanostructure supported on Ni foam shows superior catalytic activity toward the hydrogen evolution reaction (HER) with a low overpotential of 32 mV at 10 mA cm in alkaline media. Moreover, it is also capable of catalyzing the oxygen evolution reaction (OER) with high efficiency though the real active sites are surface oxides in situ formed during the catalysis. Specifically, a current density of 10 mA cm is achieved at overpotential of 280 mV. These overpotentials are among the best reported values for non-noble metal catalysts. Most importantly, when used as both the cathode and anode for overall water splitting, a current density of 10 mA cm is achieved at a cell voltage as low as 1.58 V, making NiCoP among the most efficient earth-abundant catalysts for water splitting. Moreover, our new synthetic approach can serve as a versatile route to synthesize various bimetallic or even more complex phosphides for various applications.

  1. Atmospheric pressure plasma assisted calcination by the preparation of TiO2 fibers in submicron scale

    Science.gov (United States)

    Medvecká, Veronika; Kováčik, Dušan; Zahoranová, Anna; Černák, Mirko

    2018-01-01

    Atmospheric pressure plasma assisted calcination by the preparation of TiO2 submicron fibers as a low-temperature alternative to the conventional thermal annealing was studied. A special type of dielectric barrier discharge was used for plasma treatment of hybrid titanium butoxide/polyvinylpyrrolidone (Ti(Bu)/PVP) fibers prepared by forcespinning to decompose and oxidize the base polymer and precursor. The obtained fibers were characterized by changes in chemical bonds on the surface using Fourier Transform Infrared Spectroscopy (FTIR), chemical composition by using Energy-Dispersive X-Ray Spectroscopy (EDX), X-ray Photoelectron Spectroscopy (XPS). The morphology of fibers was investigated by Scanning Electron Microscopy (SEM). A significant decrease of organic components was reached by short plasma exposure times less than 1 h. The obtained fibers exhibit a high surface porosity without degradation of the fibrous structure. The results obtained indicate that atmospheric pressure plasma assisted calcination can be a viable low-temperature, energy- and time-saving alternative or pre-treatment method for the conventional high-temperature thermal calcination.

  2. Improvement of laser keyhole formation with the assistance of arc plasma in the hybrid welding process of magnesium alloy

    Science.gov (United States)

    Liu, Liming; Hao, Xinfeng

    2009-11-01

    In the previous work, low-power laser/arc hybrid welding technique is used to weld magnesium alloy and high-quality weld joints are obtained. In order to make clear the interactions between low-power laser pulse and arc plasma, the effect of arc plasma on laser pulse is studied in this article. The result shows that the penetration of low-power laser welding with the assistance of TIG arc is more than two times deeper than that of laser welding alone and laser welding transforms from thermal-conduction mode to keyhole mode. The plasma behaviors and spectra during the welding process are studied, and the transition mechanism of laser-welding mode is analyzed in detail. It is also found that with the assistance of arc plasma, the threshold value of average power density to form keyhole welding for YAG laser is only 3.3×10 4 W/cm 2, and the average peak power density is 2.6×10 5 W/cm 2 in the present experiment. Moreover, the distribution of energy density during laser pulse is modulated to improve the formation and stability of laser keyholes.

  3. ECRH-assisted plasma start-up with toroidally inclined launch: multi-machine comparison and perspectives for ITER

    International Nuclear Information System (INIS)

    Stober, J.; Hobirk, J.; Lunt, T.; Jackson, G.L.; Hyatt, A.W.; Luce, T.; Ascasibar, E.; Cappa, A.; Bae, Y.-S.; Joung, M.; Bucalossi, J.; Casper, T.; Gribov, Y.; Cho, M.-H.; Jeong, J.-H.; Namkung, W.; Park, S.-I.; Granucci, G.; Hanada, K.; Ide, S.

    2011-01-01

    Electron cyclotron resonance heating (ECRH)-assisted plasma breakdown is foreseen with full and half magnetic field in ITER. As reported earlier, the corresponding O1- and X2-schemes have been successfully used to assist pre-ionization and breakdown in present-day devices. This contribution reports on common experiments studying the effect of toroidal inclination of the ECR beam, which is ≥20 0 in ITER. All devices could demonstrate successful breakdown assistance for this case also, although in some experiments the necessary power was almost a factor of 2 higher compared with perpendicular launch. Differences between the devices with regard to the required power and vertical field are discussed and analysed. In contrast to most of these experiments, ITER will build up loop voltage prior to the formation of the field null due to the strong shielding by the vessel. Possible consequences of this difference are discussed.

  4. Energy confinement in the torsatron URAGAN-3M during the rf-heating mode

    International Nuclear Information System (INIS)

    Pashnev, V.K.; Burchenko, P.Ya.; Lozin, A.V. and others

    2008-01-01

    Energy confinement time of plasma in torsatron U-3M was measured both during quasi-stationary study of RF-discharge and after RF-power cut-off. Power absorbed by plasma in the confinement region was estimated. A mechanism which explain the plasma density behavior in the confinement region is proposed

  5. Effect of Plasma, RF, and RIE Treatments on Properties of Double-Sided High Voltage Solar Cells with Vertically Aligned p-n Junctions

    Directory of Open Access Journals (Sweden)

    Mykola O. Semenenko

    2016-01-01

    Full Text Available Si-based solar cells with vertically aligned p-n junctions operating at high voltage were designed and fabricated. The plasma treatments and antireflection coating deposition on the working surfaces of both single- and multijunction cells were made using the special holders. It was shown that additional treatment of solar cells in argon plasma prior to hydrogen plasma treatment and deposition of diamond-like carbon antireflection films led to the improvement of the cell efficiency by up to 60%. Radio frequency waves support plasma generation and improve photoelectric conversion mainly due to reduction of internal stresses at the interfaces. Application of reactive ion etching technique removes the broken layer, reduces elastic strain in the wafer, decreases recombination of charge carriers in the bulk, and provides cell efficiency increase by up to ten times.

  6. Studies of RF sheaths and diagnostics on IShTAR

    Energy Technology Data Exchange (ETDEWEB)

    Crombé, K., E-mail: Kristel.Crombe@UGent.be [Department of Applied Physics, Ghent University, Ghent (Belgium); LPP-ERM/KMS, Royal Military Academy, Brussels (Belgium); Devaux, S.; Faudot, E.; Heuraux, S.; Moritz, J. [YIJL, UMR7198 CNRS-Université de Lorraine, Nancy (France); D’Inca, R.; Faugel, H.; Fünfgelder, H.; Jacquot, J.; Ochoukov, R. [Max-Planck-Institut für Plasmaphysik, Garching (Germany); Louche, F.; Tripsky, M.; Van Eester, D.; Wauters, T. [LPP-ERM/KMS, Royal Military Academy, Brussels (Belgium); Noterdaeme, J.-M. [Department of Applied Physics, Ghent University, Ghent (Belgium); Max-Planck-Institut für Plasmaphysik, Garching (Germany)

    2015-12-10

    IShTAR (Ion cyclotron Sheath Test ARrangement) is a linear magnetised plasma test facility for RF sheaths studies at the Max-Planck-Institut für Plasmaphysik in Garching. In contrast to a tokamak, a test stand provides more liberty to impose the parameters and gives better access for the instrumentation and antennas. The project will support the development of diagnostic methods for characterising RF sheaths and validate and improve theoretical predictions. The cylindrical vacuum vessel has a diameter of 1 m and is 1.1 m long. The plasma is created by an external cylindrical plasma source equipped with a helical antenna that has been designed to excite the m=1 helicon mode. In inductive mode, plasma densities and electron temperatures have been characterised with a planar Langmuir probe as a function of gas pressure and input RF power. A 2D array of RF compensated Langmuir probes and a spectrometer are planned. A single strap RF antenna has been designed; the plasma-facing surface is aligned to the cylindrical plasma to ease the modelling. The probes will allow direct measurements of plasma density profiles in front of the RF antenna, and thus a detailed study of the density modifications induced by RF sheaths, which influences the coupling. The RF antenna frequency has been chosen to study different plasma wave interactions: the accessible plasma density range includes an evanescent and propagative behaviour of slow or fast waves, and allows the study of the effect of the lower hybrid resonance layer.

  7. RF feedback for KEKB

    Energy Technology Data Exchange (ETDEWEB)

    Ezura, Eizi; Yoshimoto, Shin-ichi; Akai, Kazunori [National Lab. for High Energy Physics, Tsukuba, Ibaraki (Japan)

    1996-08-01

    This paper describes the present status of the RF feedback development for the KEK B-Factory (KEKB). A preliminary experiment concerning the RF feedback using a parallel comb-filter was performed through a choke-mode cavity and a klystron. The RF feedback has been tested using the beam of the TRISTAN Main Ring, and has proved to be effective in damping the beam instability. (author)

  8. RF guns: a review

    International Nuclear Information System (INIS)

    Travier, C.

    1990-06-01

    Free Electron Lasers and future linear colliders require very bright electron beams. Conventional injectors made of DC guns and RF bunchers have intrinsic limitations. The recently proposed RF guns have already proven their capability to produce bright beams. The necessary effort to improve further these performances and to gain reliability is now undertaken by many laboratories. More than twenty RF gun projects both thermionic and laser-driven are reviewed. Their specific characteristics are outlined and their nominal performances are given

  9. Methods of gas purification and effect on the ion composition in an RF atmospheric pressure plasma jet investigated by mass spectrometry

    International Nuclear Information System (INIS)

    Grosse-Kreul, Simon; Huebner, Simon; Schneider, Simon; Keudell, Achim von; Benedikt, Jan

    2016-01-01

    The analysis of the ion chemistry of atmospheric pressure plasmas is essential to evaluate ionic reaction pathways during plasma-surface or plasma-analyte interactions. In this contribution, the ion chemistry of a radio-frequency atmospheric pressure plasma jet (μ-APPJ) operated in helium is investigated by mass spectrometry (MS). It is found, that the ion composition is extremely sensitive to impurities such as N 2 , O 2 and H 2 O. Without gas purification, protonated water cluster ions of the form H + (H 2 O) n are dominating downstream the positive ion mass spectrum. However, even after careful feed gas purification to the sub-ppm level using a molecular sieve trap and a liquid nitrogen trap as well as operation of the plasma in a controlled atmosphere, the positive ion mass spectrum is strongly influenced by residual trace gases. The observations support the idea that species with a low ionization energy serve as a major source of electrons in atmospheric pressure helium plasmas. Similarly, the neutral density of atomic nitrogen measured by MS in a He/N 2 mixture is varying up to a factor 3, demonstrating the significant influence of impurities on the neutral species chemistry as well. (orig.)

  10. Methods of gas purification and effect on the ion composition in an RF atmospheric pressure plasma jet investigated by mass spectrometry

    Energy Technology Data Exchange (ETDEWEB)

    Grosse-Kreul, Simon; Huebner, Simon; Schneider, Simon; Keudell, Achim von; Benedikt, Jan [Ruhr-Universitaet Bochum, Institute for Experimental Physics II, Bochum (Germany)

    2016-12-15

    The analysis of the ion chemistry of atmospheric pressure plasmas is essential to evaluate ionic reaction pathways during plasma-surface or plasma-analyte interactions. In this contribution, the ion chemistry of a radio-frequency atmospheric pressure plasma jet (μ-APPJ) operated in helium is investigated by mass spectrometry (MS). It is found, that the ion composition is extremely sensitive to impurities such as N{sub 2}, O{sub 2} and H{sub 2}O. Without gas purification, protonated water cluster ions of the form H{sup +}(H{sub 2}O){sub n} are dominating downstream the positive ion mass spectrum. However, even after careful feed gas purification to the sub-ppm level using a molecular sieve trap and a liquid nitrogen trap as well as operation of the plasma in a controlled atmosphere, the positive ion mass spectrum is strongly influenced by residual trace gases. The observations support the idea that species with a low ionization energy serve as a major source of electrons in atmospheric pressure helium plasmas. Similarly, the neutral density of atomic nitrogen measured by MS in a He/N{sub 2} mixture is varying up to a factor 3, demonstrating the significant influence of impurities on the neutral species chemistry as well. (orig.)

  11. Time-Resolved Quantum Cascade Laser Absorption Spectroscopy of Pulsed Plasma Assisted Chemical Vapor Deposition Processes Containing BCl3

    Science.gov (United States)

    Lang, Norbert; Hempel, Frank; Strämke, Siegfried; Röpcke, Jürgen

    2011-08-01

    In situ measurements are reported giving insight into the plasma chemical conversion of the precursor BCl3 in industrial applications of boriding plasmas. For the online monitoring of its ground state concentration, quantum cascade laser absorption spectroscopy (QCLAS) in the mid-infrared spectral range was applied in a plasma assisted chemical vapor deposition (PACVD) reactor. A compact quantum cascade laser measurement and control system (Q-MACS) was developed to allow a flexible and completely dust-sealed optical coupling to the reactor chamber of an industrial plasma surface modification system. The process under the study was a pulsed DC plasma with periodically injected BCl3 at 200 Pa. A synchronization of the Q-MACS with the process control unit enabled an insight into individual process cycles with a sensitivity of 10-6 cm-1·Hz-1/2. Different fragmentation rates of the precursor were found during an individual process cycle. The detected BCl3 concentrations were in the order of 1014 molecules·cm-3. The reported results of in situ monitoring with QCLAS demonstrate the potential for effective optimization procedures in industrial PACVD processes.

  12. Detection of lung cancer using plasma protein profiling by matrix-assisted laser desorption/ionization mass spectrometry.

    Science.gov (United States)

    Shevchenko, Valeriy E; Arnotskaya, Natalia E; Zaridze, David G

    2010-01-01

    There are no satisfactory plasma biomarkers which are available for the early detection and monitoring of lung cancer, one of the most frequent cancers worldwide. The aim of this study is to explore the application of matrix-assisted laser desorption/ionization time-of-flight mass spectrometry (MALDI-ToF MS) to plasma proteomic patterns to distinguish lung cancer patients from healthy individuals. The EDTA plasma samples have been pre-fractionated using magnetic bead kits functionalized with weak cation exchange coatings. We compiled MS protein profiles for 90 patients with squamous cell carcinomas (SCC) and compared them with profiles from 187 healthy controls. The MALDI-ToF spectra were analyzed statistically using ClinProTools bioinformatics software. Depending on the sample used, up to 441 peaks/spectrum could be detected in a mass range of 1000-20,000 Da; 33 of these proteins had statistically differential expression levels between SCC and control plasma (P 90%) in external validation test. These results suggest that plasma MALDI-ToF MS protein profiling can distinguish patients with SCC and also from healthy individuals with relatively high sensitivity and specificity and that MALDI- ToF MS is a potential tool for the screening of lung cancer.

  13. Raman scattering and Rutherford backscattering studies on InN films grown by plasma-assisted molecular beam epitaxy

    International Nuclear Information System (INIS)

    Chung, Yee Ling; Peng Xingyu; Liao, Ying Chieh; Yao Shude; Chen, Li Chyong; Chen, Kuei Hsien; Feng, Zhe Chuan

    2011-01-01

    A series of InN thin films was grown on sapphire substrates via plasma-assisted molecular beam epitaxy (PA-MBE) with different nitrogen plasma power. Various characterization techniques, including Hall, photoluminescence, Raman scattering and Rutherford backscattering, have been employed to study these InN films. Good crystalline wurtzite structures have been identified for all PA-MBE grown InN films on sapphire substrate, which have narrower XRD wurtzite (0002) peaks, showed c-axis Raman scattering allowed longitudinal optical (LO) modes of A 1 and E 1 plus E 2 symmetry, and very weak backscattering forbidden transverse optical (TO) modes. The lower plasma power can lead to the lower carrier concentration, to have the InN film close to intrinsic material with the PL emission below 0.70 eV. With increasing the plasma power, high carrier concentration beyond 1 x 10 20 cm -3 can be obtained, keeping good crystalline perfection. Rutherford backscattering confirmed most of InN films keeping stoichiometrical In/N ratios and only with higher plasma power of 400 W leaded to obvious surface effect and interdiffusion between the substrate and InN film.

  14. Oak Ridge rf Test Facility

    International Nuclear Information System (INIS)

    Gardner, W.L.; Hoffman, D.J.; McCurdy, H.C.; McManamy, T.J.; Moeller, J.A.; Ryan, P.M.

    1985-01-01

    The rf Test Facility (RFTF) of Oak Ridge National Laboratory (ORNL) provides a national facility for the testing and evaluation of steady-state, high-power (approx.1.0-MW) ion cyclotron resonance heating (ICRH) systems and components. The facility consists of a vacuum vessel and two fully tested superconducting development magnets from the ELMO Bumpy Torus Proof-of-Principle (EBT-P) program. These are arranged as a simple mirror with a mirror ratio of 4.8. The axial centerline distance between magnet throat centers is 112 cm. The vacuum vessel cavity has a large port (74 by 163 cm) and a test volume adequate for testing prototypic launchers for Doublet III-D (DIII-D), Tore Supra, and the Tokamak Fusion Test Reactor (TFTR). Attached to the internal vessel walls are water-cooled panels for removing the injected rf power. The magnets are capable of generating a steady-state field of approx.3 T on axis in the magnet throats. Steady-state plasmas are generated in the facility by cyclotron resonance breakdown using a dedicated 200-kW, 28-GHz gyrotron. Available rf sources cover a frequency range of 2 to 200 MHz at 1.5 kW and 3 to 18 MHz at 200 kW, with several sources at intermediate parameters. Available in July 1986 will be a >1.0-MW, cw source spanning 40 to 80 MHz. 5 figs

  15. A new flexible DBD device for treating infected wounds: in vitro and ex vivo evaluation and comparison with a RF argon plasma jet

    International Nuclear Information System (INIS)

    Boekema, B K H L; Vlig, M; Guijt, D; Middelkoop, E; Hijnen, K; Hofmann, S; Smits, P; Sobota, A; Van Veldhuizen, E M; Bruggeman, P

    2016-01-01

    Cold plasma has been shown to provide a promising alternative antimicrobial treatment for wound healing. We developed and tested a flexible surface dielectric barrier discharge (DBD) and compared it to an argon gas based plasma jet operated remotely with a distance between plasma plume and sample of 8 mm. Tests were conducted using different models: on cultured cells, on ex vivo human skin and on bacteria (Pseudomonas aeruginosa) (on agar, in suspension, in collagen/elastin matrix or on ex vivo human skin), allowing us to directly compare bactericidal with safety aspects under identical conditions. Both plasma devices were highly efficient when used on bacteria in non-buffered solutions, but DBD was faster in reaching the maximum bacterial reduction. Treatment of bacteria on intact skin with DBD resulted in up to 6 log reductions in 3 min. The jet was far less efficient on intact skin. Even after 8 min treatment no more than 2 log reductions were obtained with the jet. Treatment of bacteria in burn wound models with DBD for 6 min resulted in a 4.5 log reduction. Even when using DBD for 6 min on infected burn wound models with colonizing or biofilm phase bacteria, the log reductions were 3.8 or 3.2 respectively. DBD plasma treatment for 6 min did not affect fibroblast viability, whereas a treatment for 8 min was detrimental. Similarly, treatment with DBD or plasma jet for 6 min did also not affect the metabolic activity of skin biopsies. After treatment for 8 min with DBD or plasma jet, 78% or 60% of activity in skin biopsies remained, respectively. Multiple treatments of in vitro burn wound models with surface DBD for 6 min or with plasma jet for 8 min did not affect re-epithelialization. With the flexible surface DBD plasma strip we were able to quickly inactivate large numbers of bacteria on and in skin. Under the same conditions, viability of skin cells or re-epithelialization was not affected. The DBD source has potential for treating

  16. Microwave plasma-assisted photoluminescence enhancement in nitrogen-doped ultrananocrystalline diamond film

    Directory of Open Access Journals (Sweden)

    Yu Lin Liu

    2012-06-01

    Full Text Available Optical properties and conductivity of nitrogen-doped ultrananocrystal diamond (UNCD films were investigated following treatment with low energy microwave plasma at room temperature. The plasma also generated vacancies in UNCD films and provided heat for mobilizing the vacancies to combine with the impurities, which formed the nitrogen-vacancy defect centers. The generated color centers were distributed uniformly in the samples. The conductivity of nitrogen-doped UNCD films treated by microwave plasma was found to decrease slightly due to the reduced grain boundaries. The photoluminescence emitted by the plasma treated nitrogen-doped UNCD films was enhanced significantly compared to the untreated films.

  17. Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers

    NARCIS (Netherlands)

    Starostin, S. A.; Keuning, W.; Schalken, J.; Creatore, M.; Kessels, W. M. M.; Bouwstra, J. B.; van de Sanden, M. C. M.; de Vries, H. W.

    2016-01-01

    The synergy between fast (1600 nm · min−1), roll-to-roll plasma-enhanced chemical vapor deposited (PE-CVD) SiO2 layers and plasma-assisted atomic layer deposited (PA-ALD) ultra-thin Al2O3 films has been investigated in terms of moisture permeation barrier properties. The effective and intrinsic

  18. Synergy between plasma-assisted ALD and roll-to-roll atmospheric pressure PE-CVD processing of moisture barrier films on polymers

    NARCIS (Netherlands)

    Starostin, S.A.; Keuning, W.; Schalken, J.R.G.; Creatore, M.; Kessels, W.M.M.; Bouwstra, J.B.; Sanden, van de M.C.M.; Vries, de H.W.

    2016-01-01

    The synergy between fast (1600 nm · min−1), roll-to-roll plasma-enhanced chemical vapor deposited (PE-CVD) SiO2 layers and plasma-assisted atomic layer deposited (PA-ALD) ultra-thin Al2O3 films has been investigated in terms of moisture permeation barrier properties. The effective and intrinsic

  19. An evaluation of microwave-assisted fusion and microwave-assisted acid digestion methods for determining elemental impurities in carbon nanostructures using inductively coupled plasma optical emission spectrometry

    KAUST Repository

    Patole, Shashikant P.

    2015-10-21

    It is common for as-prepared carbon nanotube (CNT) and graphene samples to contain remnants of the transition metals used to catalyze their growth; contamination may also leave other trace elemental impurities in the samples. Although a full quantification of impurities in as-prepared samples of carbon nanostructures is difficult, particularly when trace elements are intercalated or encapsulated within a protective layer of graphitic carbon, reliable information is essential for reasons such as quantifying the adulteration of physico-chemical properties of the materials and for evaluating environmental issues. Here, we introduce a microwave-based fusion method to degrade single- and double-walled CNTs and graphene nanoplatelets into a fusion flux thereby thoroughly leaching all metallic impurities. Subsequent dissolution of the fusion product in diluted hydrochloric and nitric acid allowed us to identify their trace elemental impurities using inductively coupled plasma optical emission spectrometry. Comparisons of the results from the proposed microwave-assisted fusion method against those of a more classical microwave-assisted acid digestion approach suggest complementarity between the two that ultimately could lead to a more reliable and less costly determination of trace elemental impurities in carbon nanostructured materials. Graphical abstract A method for the complete digestion of carbon nanostructures has been demonstrated. Photographs (on the left side) show zirconium crucibles containing SWCNTs with flux of Na2CO3 and K2CO3, before and after microwave fusion; (on the right side) the appearance of the final solutions containing dissolved samples, from microwave-assisted fusion and microwave-assisted acid digestion. These solutions were used for determining the trace elemental impurities by ICP‒OES.

  20. Rf power sources

    International Nuclear Information System (INIS)

    Allen, M.A.

    1988-01-01

    In this paper, the author reports on RF power sources for accelerator applications. The approach will be with particular customers in mind. These customers are high energy physicists who use accelerators as experimental tools in the study of the nucleus of the atom, and synchrotron light sources derived from electron or positron storage rings. The author pays close attention to electron- positron linear accelerators since the RF sources have always defined what is possible to achieve with these accelerators. Circular machines, cyclotrons, synchrotrons, etc. have usually not been limited by the RF power available and the machine builders have usually had their RF power source requirements met off the shelf. The main challenge for the RF scientist has been then in the areas of controls. An interesting example of this is in the Conceptual Design Report of the Superconducting Super Collider (SSC) where the RF system is described in six pages of text in a 700-page report. Also, the cost of that RF system is about one-third of a percent of the project's total cost. The RF system is well within the state of the art and no new power sources need to be developed. All the intellectual effort of the system designer would be devoted to the feedback systems necessary to stabilize beams during storage and acceleration, with the main engineering challenges (and costs) being in the superconducting magnet lattice

  1. RF Energy Compressor

    International Nuclear Information System (INIS)

    Farkas, Z.D.

    1980-02-01

    The RF Energy Compressor, REC described here, transforms cw rf into periodic pulses using an energy storage cavity, ESC, whose charging is controlled by 180 0 bi-phase modulation, PSK, and external Q switching, βs. Compression efficiency, C/sub e/, of 100% can be approached at any compression factor C/sub f/

  2. Practical RF system design

    CERN Document Server

    Egan, William F

    2003-01-01

    he ultimate practical resource for today's RF system design professionals Radio frequency components and circuits form the backbone of today's mobile and satellite communications networks. Consequently, both practicing and aspiring industry professionals need to be able to solve ever more complex problems of RF design. Blending theoretical rigor with a wealth of practical expertise, Practical RF System Design addresses a variety of complex, real-world problems that system engineers are likely to encounter in today's burgeoning communications industry with solutions that are not easily available in the existing literature. The author, an expert in the field of RF module and system design, provides powerful techniques for analyzing real RF systems, with emphasis on some that are currently not well understood. Combining theoretical results and models with examples, he challenges readers to address such practical issues as: * How standing wave ratio affects system gain * How noise on a local oscillator will affec...

  3. Effect of Advanced Plasma Source bias voltage on properties of HfO2 films prepared by plasma ion assisted electron evaporation from metal hafnium

    International Nuclear Information System (INIS)

    Zhu, Meiping; Yi, Kui; Arhilger, Detlef; Qi, Hongji; Shao, Jianda

    2013-01-01

    HfO 2 films, using metal hafnium as starting material, are deposited by plasma-ion assisted electron evaporation with different Advanced Plasma Source (APS) bias voltages. The refractive index and extinction coefficient are calculated, the chemical state and composition, as well as the stress and aging behavior is investigated. Laser induced damage threshold (LIDT) and damage mechanism are also evaluated and discussed. Optical, structural, mechanical and laser induced damage properties of HfO 2 films are found to be sensitive to APS bias voltage. The film stress can be tuned by varying the APS bias voltage. Damage morphologies indicate the LIDT of the HfO 2 films at 1064 nm and 532 nm are dominated by the nodular-defect density in coatings, while the 355 nm LIDT is dominated by the film absorption. HfO 2 films with higher 1064 nm LIDT than samples evaporated from hafnia are achieved with bias voltage of 100 V. - Highlights: • HfO 2 films are evaporated with different Advanced Plasma Source (APS) bias voltages. • Properties of HfO 2 films are sensitive to APS bias voltage. • With a bias voltage of 100 V, HfO 2 coatings without any stress can be achieved. • Higher 1064 nm laser induced damage threshold is achieved at a bias voltage of 100 V

  4. Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films

    International Nuclear Information System (INIS)

    Bolat, Sami; Tekcan, Burak; Ozgit-Akgun, Cagla; Biyikli, Necmi; Okyay, Ali Kemal

    2015-01-01

    Electronic and optoelectronic devices, namely, thin film transistors (TFTs) and metal–semiconductor–metal (MSM) photodetectors, based on GaN films grown by hollow cathode plasma-assisted atomic layer deposition (PA-ALD) are demonstrated. Resistivity of GaN thin films and metal-GaN contact resistance are investigated as a function of annealing temperature. Effect of the plasma gas and postmetallization annealing on the performances of the TFTs as well as the effect of the annealing on the performance of MSM photodetectors are studied. Dark current to voltage and responsivity behavior of MSM devices are investigated as well. TFTs with the N 2 /H 2 PA-ALD based GaN channels are observed to have improved stability and transfer characteristics with respect to NH 3 PA-ALD based transistors. Dark current of the MSM photodetectors is suppressed strongly after high-temperature annealing in N 2 :H 2 ambient

  5. Modeling plasma-assisted growth of graphene-carbon nanotube hybrid

    Energy Technology Data Exchange (ETDEWEB)

    Tewari, Aarti [Department of Applied Physics, Delhi Technological University, Shahbad Daulatpur, Bawana Road, Delhi 110 042 (India)

    2016-08-15

    A theoretical model describing the growth of graphene-CNT hybrid in a plasma medium is presented. Using the model, the growth of carbon nanotube (CNT) on a catalyst particle and thereafter the growth of the graphene on the CNT is studied under the purview of plasma sheath and number density kinetics of different plasma species. It is found that the plasma parameter such as ion density; gas ratios and process parameter such as source power affect the CNT and graphene dimensions. The variation in growth rates of graphene and CNT under different plasma power, gas ratios, and ion densities is analyzed. Based on the results obtained, it can be concluded that higher hydrocarbon ion densities and gas ratios of hydrocarbon to hydrogen favor the growth of taller CNTs and graphene, respectively. In addition, the CNT tip radius reduces with hydrogen ion density and higher plasma power favors graphene with lesser thickness. The present study can help in better understanding of the graphene-CNT hybrid growth in a plasma medium.

  6. Modeling plasma-assisted growth of graphene-carbon nanotube hybrid

    International Nuclear Information System (INIS)

    Tewari, Aarti

    2016-01-01

    A theoretical model describing the growth of graphene-CNT hybrid in a plasma medium is presented. Using the model, the growth of carbon nanotube (CNT) on a catalyst particle and thereafter the growth of the graphene on the CNT is studied under the purview of plasma sheath and number density kinetics of different plasma species. It is found that the plasma parameter such as ion density; gas ratios and process parameter such as source power affect the CNT and graphene dimensions. The variation in growth rates of graphene and CNT under different plasma power, gas ratios, and ion densities is analyzed. Based on the results obtained, it can be concluded that higher hydrocarbon ion densities and gas ratios of hydrocarbon to hydrogen favor the growth of taller CNTs and graphene, respectively. In addition, the CNT tip radius reduces with hydrogen ion density and higher plasma power favors graphene with lesser thickness. The present study can help in better understanding of the graphene-CNT hybrid growth in a plasma medium.

  7. PEP-II RF System Operation and Performance

    International Nuclear Information System (INIS)

    McIntosh, P.

    2005-01-01

    The Low Energy Ring (LER) and High Energy Ring (HER) RF systems have operated now on PEP-II since July 1998 and have assisted in breaking all design luminosity records back in June 2001. Luminosity on PEP-II has steadily increased since then as a consequence of larger e+ and e- beam currents being accumulated. This has meant that the RF systems have inevitably been driven harder, not only to achieve these higher stored beam currents, but also to reliably keep the beams circulating whilst at the same time minimizing the number of aborts due to RF system faults. This paper details the current PEP-II RF system configurations for both rings, as well as future upgrade plans spanning the next 3-5 years. Limitations of the current RF system configurations are presented, highlighting improvement projects which will target specific areas within the RF systems to ensure that adequate operating overheads are maintained and reliable operation is assured. The Low Energy Ring (LER) and High Energy Ring (HER) RF systems have operated now on PEP-II since July 1998 and have assisted in breaking all design luminosity records back in June 2001. Luminosity on PEP-II has steadily increased since then as a consequence of larger e+ and e- beam currents being accumulated. This has meant that the RF systems have inevitably been driven harder, not only to achieve these higher stored beam currents, but also to reliably keep the beams circulating whilst at the same time minimizing the number of aborts due to RF system faults. This paper details the current PEP-II RF system configurations for both rings, as well as future upgrade plans spanning the next 3-5 years. Limitations of the current RF system configurations are presented, highlighting improvement projects which will target specific areas within the RF systems to ensure that adequate operating overheads are maintained and reliable operation is assured

  8. Composite SiO.sub.x./sub./hydrocarbon plasma polymer films prepared by RF magnetron sputtering of SiO.sub.2./sub. and polyethylene or polypropylene

    Czech Academy of Sciences Publication Activity Database

    Pihosh, Y.; Biederman, H.; Slavínská, D.; Kousal, J.; Choukourov, A.; Trchová, Miroslava; Macková, Anna; Boldyryeva, Hanna

    2006-01-01

    Roč. 81, 1-4 (2006), s. 32-37 ISSN 0042-207X R&D Projects: GA MŠk 1P05ME754 Institutional research plan: CEZ:AV0Z40500505; CEZ:AV0Z10480505 Keywords : composite films * magnetron * sputtering Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 0.834, year: 2006

  9. Composite SiOx/fluorocarbon plasma polymer films prepared by r.f. magnetron sputtering of SiO2 and PTFE

    Czech Academy of Sciences Publication Activity Database

    Pihosh, Y.; Biederman, H.; Slavínská, D.; Kousal, J.; Choukourov, A.; Trchová, Miroslava; Macková, Anna; Boldyryeva, Hanna

    2006-01-01

    Roč. 81, 1-4 (2006), s. 38-44 ISSN 0042-207X R&D Projects: GA MŠk OC 527.10; GA MŠk ME 553 Institutional research plan: CEZ:AV0Z40500505; CEZ:AV0Z10480505 Keywords : composite films * magnetron * sputtering Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 0.834, year: 2006

  10. Microfluidic stretchable RF electronics.

    Science.gov (United States)

    Cheng, Shi; Wu, Zhigang

    2010-12-07

    Stretchable electronics is a revolutionary technology that will potentially create a world of radically different electronic devices and systems that open up an entirely new spectrum of possibilities. This article proposes a microfluidic based solution for stretchable radio frequency (RF) electronics, using hybrid integration of active circuits assembled on flex foils and liquid alloy passive structures embedded in elastic substrates, e.g. polydimethylsiloxane (PDMS). This concept was employed to implement a 900 MHz stretchable RF radiation sensor, consisting of a large area elastic antenna and a cluster of conventional rigid components for RF power detection. The integrated radiation sensor except the power supply was fully embedded in a thin elastomeric substrate. Good electrical performance of the standalone stretchable antenna as well as the RF power detection sub-module was verified by experiments. The sensor successfully detected the RF radiation over 5 m distance in the system demonstration. Experiments on two-dimensional (2D) stretching up to 15%, folding and twisting of the demonstrated sensor were also carried out. Despite the integrated device was severely deformed, no failure in RF radiation sensing was observed in the tests. This technique illuminates a promising route of realizing stretchable and foldable large area integrated RF electronics that are of great interest to a variety of applications like wearable computing, health monitoring, medical diagnostics, and curvilinear electronics.

  11. NCSX Plasma Heating Methods

    International Nuclear Information System (INIS)

    Kugel, H.W.; Spong, D.; Majeski, R.; Zarnstorff, M.

    2008-01-01

    The National Compact Stellarator Experiment (NCSX) has been designed to accommodate a variety of heating systems, including ohmic heating, neutral beam injection, and radio-frequency (rf). Neutral beams will provide one of the primary heating methods for NCSX. In addition to plasma heating, neutral beams are also expected to provide a means for external control over the level of toroidal plasma rotation velocity and its profile. The experimental plan requires 3 MW of 50-keV balanced neutral beam tangential injection with pulse lengths of 500 ms for initial experiments, to be upgradeable to pulse lengths of 1.5 s. Subsequent upgrades will add 3MW of neutral beam injection (NBI). This paper discusses the NCSX NBI requirements and design issues and shows how these are provided by the candidate PBX-M NBI system. In addition, estimations are given for beam heating efficiencies, scaling of heating efficiency with machine size and magnetic field level, parameter studies of the optimum beam injection tangency radius and toroidal injection location, and loss patterns of beam ions on the vacuum chamber wall to assist placement of wall armor and for minimizing the generation of impurities by the energetic beam ions. Finally, subsequent upgrades could add an additional 6 MW of rf heating by mode conversion ion Bernstein wave (MCIBW) heating, and if desired as possible future upgrades, the design also will accommodate high-harmonic fast-wave and electron cyclotron heating. The initial MCIBW heating technique and the design of the rf system lend themselves to current drive, so if current drive became desirable for any reason, only minor modifications to the heating system described here would be needed. The rf system will also be capable of localized ion heating (bulk or tail), and possibly IBW-generated sheared flows

  12. ICH antenna development on the ORNL RF Test Facility

    International Nuclear Information System (INIS)

    Gardner, W.L.; Bigelow, T.S.; Haste, G.R.; Hoffman, D.J.; Livesey, R.L.

    1987-01-01

    A compact resonant loop antenna is installed on the ORNL Radio Frequency Test Facility (RFTF). Facility characteristics include a steady-state magnetic field of ∼ 0.5 T at the antenna, microwave-generated plasmas with n e ∼ 10 12 cm -3 and T e ∼ 8 eV, and 100 kW of 25-MHz rf power. The antenna is tunable from ∼22--75 MHz, is designed to handle ≥1 MW of rf power, and can be moved 5 cm with respect to the port flange. Antenna characteristics reported and discussed include the effect of magnetic field on rf voltage breakdown at the capacitor, the effects of magnetic field and plasma on rf voltage breakdown between the radiating element and the Faraday shield, the effects of graphite on Faraday shield losses, and the efficiency of coupling to the plasma. 2 refs., 4 figs

  13. Compact microwave re-entrant cavity applicator for plasma-assisted combustion

    Science.gov (United States)

    Hemawan, Kadek W.; Wichman, Indrek S.; Lee, Tonghun; Grotjohn, Timothy A.; Asmussen, Jes

    2009-05-01

    The design and experimental operation of a compact microwave/rf applicator is described. This applicator operates at atmospheric pressure and couples electromagnetic energy into a premixed CH4/O2 flame. The addition of only 2-15 W of microwave power to a premixed combustion flame with a flame power of 10-40 W serves to extend the flammability limits for fuel lean conditions, increases the flame length and intensity, and increases the number density and mixture of excited radical species in the flame vicinity. The downstream gas temperature also increases. Optical emission spectroscopy measurements show gas rotational temperatures in the range of 2500-3600 K. At the higher input power of ≥10 W microplasma discharges can be produced in the high electric field region of the applicator.

  14. Compact microwave re-entrant cavity applicator for plasma-assisted combustion

    International Nuclear Information System (INIS)

    Hemawan, Kadek W.; Wichman, Indrek S.; Lee, Tonghun; Grotjohn, Timothy A.; Asmussen, Jes

    2009-01-01

    The design and experimental operation of a compact microwave/rf applicator is described. This applicator operates at atmospheric pressure and couples electromagnetic energy into a premixed CH 4 /O 2 flame. The addition of only 2-15 W of microwave power to a premixed combustion flame with a flame power of 10-40 W serves to extend the flammability limits for fuel lean conditions, increases the flame length and intensity, and increases the number density and mixture of excited radical species in the flame vicinity. The downstream gas temperature also increases. Optical emission spectroscopy measurements show gas rotational temperatures in the range of 2500-3600 K. At the higher input power of ≥10 W microplasma discharges can be produced in the high electric field region of the applicator.

  15. Compact microwave re-entrant cavity applicator for plasma-assisted combustion

    Energy Technology Data Exchange (ETDEWEB)

    Hemawan, Kadek W. [Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824 (United States); Wichman, Indrek S.; Lee, Tonghun [Department of Mechanical Engineering, Michigan State University, East Lansing, Michigan 48824 (United States); Grotjohn, Timothy A.; Asmussen, Jes [Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824 (United States); Center for Coatings and Laser Applications, Fraunhofer USA, East Lansing, Michigan 48824 (United States)

    2009-05-15

    The design and experimental operation of a compact microwave/rf applicator is described. This applicator operates at atmospheric pressure and couples electromagnetic energy into a premixed CH{sub 4}/O{sub 2} flame. The addition of only 2-15 W of microwave power to a premixed combustion flame with a flame power of 10-40 W serves to extend the flammability limits for fuel lean conditions, increases the flame length and intensity, and increases the number density and mixture of excited radical species in the flame vicinity. The downstream gas temperature also increases. Optical emission spectroscopy measurements show gas rotational temperatures in the range of 2500-3600 K. At the higher input power of {>=}10 W microplasma discharges can be produced in the high electric field region of the applicator.

  16. Versatile rf controller

    International Nuclear Information System (INIS)

    Howard, D.

    1985-05-01

    The low level rf system developed for the new Bevatron local injector provides precise control and regulation of the rf phase and amplitude for three 200 MHz linac cavities. The main features of the system are: extensive use of inexpensive, off-the-shelf components, ease of maintenance, and adaptability to a wide range of operation frequencies. The system utilizes separate function, easily removed rf printed circuit cards interconnected via the edge connectors. Control and monitoring are available both locally and through the computer. This paper will describe these features as well as the few component changes that would be required to adapt the techniques to other operating frequencies. 2 refs

  17. Precise alignment of the collection fiber assisted by real-time plasma imaging in laser-induced breakdown spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Motto-Ros, V., E-mail: vincent.motto-ros@univ-lyon1.fr [Institut Lumière Matière, UMR 5306 Université Lyon 1-CNRS, Université de Lyon, 69622 Villeurbanne cedex (France); Negre, E. [Institut Lumière Matière, UMR 5306 Université Lyon 1-CNRS, Université de Lyon, 69622 Villeurbanne cedex (France); CRITT Matériaux Alsace, 19, rue de St Junien, 67305 Schiltigheim (France); Pelascini, F. [CRITT Matériaux Alsace, 19, rue de St Junien, 67305 Schiltigheim (France); Panczer, G.; Yu, J. [Institut Lumière Matière, UMR 5306 Université Lyon 1-CNRS, Université de Lyon, 69622 Villeurbanne cedex (France)

    2014-02-01

    Improving the repeatability and the reproducibility of measurement with laser-induced breakdown spectroscopy (LIBS) is one of the actual challenging issues faced by the technique to fit the requirements of precise and accurate quantitative analysis. Among the numerous factors influencing the measurement stability in short and long terms, there are shot-to-shot and day-to-day fluctuations of the morphology of the plasma. Such fluctuations are due to the high sensitivity of laser-induced plasma to experimental conditions including properties of the sample, the laser parameters as well as properties of the ambient gas. In this paper, we demonstrate that precise alignment of the optical fiber for the collection of the plasma emission with respect to the actual morphology of the plasma assisted by real-time imaging, greatly improves the stability of LIBS measurements in short as well as in long terms. The used setup is based on a plasma imaging arrangement using a CCD camera and a real-time image processing. The obtained plasma image is displayed in a 2-dimensional frame where the position of the optical fiber is beforehand calibrated. In addition, the setup provides direct sample surface monitoring, which allows a precise control of the distance between the focusing lens and the sample surface. Test runs with a set of 8 reference samples show very high determination coefficient for calibration curves (R{sup 2} = 0.9999), and a long term repeatability and reproducibility of 4.6% (relative standard deviation) over a period of 3 months without any signal normalization. The capacity of the system to automatically correct the sample surface position for a tilted or non-regular sample surface during a surface mapping measurement is also demonstrated. - Highlights: • Automated alignment of the collection fiber by real-time plasma imaging • High level control of experimental parameters in LIBS experiments • Improvement of the short and long term stability in LIBS

  18. Precise alignment of the collection fiber assisted by real-time plasma imaging in laser-induced breakdown spectroscopy

    International Nuclear Information System (INIS)

    Motto-Ros, V.; Negre, E.; Pelascini, F.; Panczer, G.; Yu, J.

    2014-01-01

    Improving the repeatability and the reproducibility of measurement with laser-induced breakdown spectroscopy (LIBS) is one of the actual challenging issues faced by the technique to fit the requirements of precise and accurate quantitative analysis. Among the numerous factors influencing the measurement stability in short and long terms, there are shot-to-shot and day-to-day fluctuations of the morphology of the plasma. Such fluctuations are due to the high sensitivity of laser-induced plasma to experimental conditions including properties of the sample, the laser parameters as well as properties of the ambient gas. In this paper, we demonstrate that precise alignment of the optical fiber for the collection of the plasma emission with respect to the actual morphology of the plasma assisted by real-time imaging, greatly improves the stability of LIBS measurements in short as well as in long terms. The used setup is based on a plasma imaging arrangement using a CCD camera and a real-time image processing. The obtained plasma image is displayed in a 2-dimensional frame where the position of the optical fiber is beforehand calibrated. In addition, the setup provides direct sample surface monitoring, which allows a precise control of the distance between the focusing lens and the sample surface. Test runs with a set of 8 reference samples show very high determination coefficient for calibration curves (R 2 = 0.9999), and a long term repeatability and reproducibility of 4.6% (relative standard deviation) over a period of 3 months without any signal normalization. The capacity of the system to automatically correct the sample surface position for a tilted or non-regular sample surface during a surface mapping measurement is also demonstrated. - Highlights: • Automated alignment of the collection fiber by real-time plasma imaging • High level control of experimental parameters in LIBS experiments • Improvement of the short and long term stability in LIBS measurements

  19. A Plasma-Assisted Route to the Rapid Preparation of Transition-Metal Phosphides for Energy Conversion and Storage

    KAUST Repository

    Liang, Hanfeng

    2017-06-06

    Transition-metal phosphides (TMPs) are important materials that have been widely used in catalysis, supercapacitors, batteries, sensors, light-emitting diodes, and magnets. The physical and chemical structure of a metal phosphide varies with the method of preparation as the electronic, catalytic, and magnetic properties of the metal phosphides strongly depend on their synthesis routes. Commonly practiced processes such as solid-state synthesis and ball milling have proven to be reliable routes to prepare TMPs but they generally require high temperature and long reaction time. Here, a recently developed plasma-assisted conversion route for the preparation of TMPs is reviewed, along with their applications in energy conversion and storage, including water oxidation electrocatalysis, sodium-ion batteries, and supercapacitors. The plasma-assisted synthetic route should open up a new avenue to prepare TMPs with tailored structure and morphology for various applications. In fact, the process may be further extended to the synthesis of a wide range of transition-metal compounds such as borides and fluorides at low temperature and in a rapid manner.

  20. Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Nepal, Neeraj; Anderson, Virginia R.; Hite, Jennifer K.; Eddy, Charles R.

    2015-08-31

    We report the growth and characterization of III-nitride ternary thin films (Al{sub x}Ga{sub 1−x}N, In{sub x}Al{sub 1−x}N and In{sub x}Ga{sub 1−x}N) at ≤ 500 °C by plasma assisted atomic layer epitaxy (PA-ALE) over a wide stoichiometric range including the range where phase separation has been an issue for films grown by molecular beam epitaxy and metal organic chemical vapor deposition. The composition of these ternaries was intentionally varied through alterations in the cycle ratios of the III-nitride binary layers (AlN, GaN, and InN). By this digital alloy growth method, we are able to grow III-nitride ternaries by PA-ALE over nearly the entire stoichiometry range including in the spinodal decomposition region (x = 15–85%). These early efforts suggest great promise of PA-ALE at low temperatures for addressing miscibility gap challenges encountered with conventional growth methods and realizing high performance optoelectronic and electronic devices involving ternary/binary heterojunctions, which are not currently possible. - Highlights: • III-N ternaries grown at ≤ 500 °C by plasma assisted atomic layer epitaxy • Growth of InGaN and AlInN in the spinodal decomposition region (15–85%) • Epitaxial, smooth and uniform III-N film growth at low temperatures.

  1. Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures

    International Nuclear Information System (INIS)

    Nepal, Neeraj; Anderson, Virginia R.; Hite, Jennifer K.; Eddy, Charles R.

    2015-01-01

    We report the growth and characterization of III-nitride ternary thin films (Al x Ga 1−x N, In x Al 1−x N and In x Ga 1−x N) at ≤ 500 °C by plasma assisted atomic layer epitaxy (PA-ALE) over a wide stoichiometric range including the range where phase separation has been an issue for films grown by molecular beam epitaxy and metal organic chemical vapor deposition. The composition of these ternaries was intentionally varied through alterations in the cycle ratios of the III-nitride binary layers (AlN, GaN, and InN). By this digital alloy growth method, we are able to grow III-nitride ternaries by PA-ALE over nearly the entire stoichiometry range including in the spinodal decomposition region (x = 15–85%). These early efforts suggest great promise of PA-ALE at low temperatures for addressing miscibility gap challenges encountered with conventional growth methods and realizing high performance optoelectronic and electronic devices involving ternary/binary heterojunctions, which are not currently possible. - Highlights: • III-N ternaries grown at ≤ 500 °C by plasma assisted atomic layer epitaxy • Growth of InGaN and AlInN in the spinodal decomposition region (15–85%) • Epitaxial, smooth and uniform III-N film growth at low temperatures

  2. Study of the adhesive properties versus stability/aging of hernia repair meshes after deposition of RF activated plasma polymerized acrylic acid coating

    International Nuclear Information System (INIS)

    Rivolo, Paola; Nisticò, Roberto; Barone, Fabrizio; Faga, Maria Giulia; Duraccio, Donatella; Martorana, Selanna; Ricciardi, Serena; Magnacca, Giuliana

    2016-01-01

    In order to confer adhesive properties to commercial polypropylene (PP) meshes, a surface plasma-induced deposition of poly-(acrylic acid) (PPAA) is performed. Once biomaterials were functionalized, different post-deposition treatments (i.e. water washing and/or thermal treatments) were investigated with the aim of monitoring the coating degradation (and therefore the loss of adhesion) after 3 months of aging in both humid/oxidant (air) and inert (nitrogen) atmospheres. A wide physicochemical characterization was carried out in order to evaluate the functionalization effectiveness and the adhesive coating homogeneity by means of static water drop shape analysis and several spectroscopies (namely, FTIR, UV–Visible and X-ray Photoemission Spectroscopy). The modification of the adhesion properties after post-deposition treatments as well as aging under different storage atmospheres were investigated by means of Atomic Force Microscopy (AFM) used in Force/Distance (F/D) mode. This technique confirms itself as a powerful tool for unveiling the surface adhesion capacity as well as the homogeneity of the functional coatings along the fibers. Results obtained evidenced that post-deposition treatments are mandatory in order to remove all oligomers produced during the plasma-treatment, whereas aging tests evidenced that these devices can be simply stored in presence of air for at least three months without a meaningful degradation of the original properties. - Highlights: • Plasma polymerized surface functionalization of hernia-repair meshes was used to confer adhesive properties. • The stability of the adhesive coating was verified under different post-deposition conditions. • The use of AFM in F/D mode was selected to monitor the coating degradation.

  3. Study of the adhesive properties versus stability/aging of hernia repair meshes after deposition of RF activated plasma polymerized acrylic acid coating

    Energy Technology Data Exchange (ETDEWEB)

    Rivolo, Paola [Politecnico di Torino, Department of Applied Science and Technology, C.so Duca degli Abruzzi 24, 10129 Torino (Italy); Nisticò, Roberto, E-mail: roberto.nistico@unito.it [University of Torino, Department of Chemistry and NIS Centre, Via P. Giuria 7, 10125 Torino (Italy); Barone, Fabrizio [University of Torino, Department of Chemistry and NIS Centre, Via P. Giuria 7, 10125 Torino (Italy); Faga, Maria Giulia; Duraccio, Donatella [CNR-IMAMOTER, Strada delle Cacce 73, 10135 Torino (Italy); Martorana, Selanna [Herniamesh S.r.l., Via F.lli Meliga 1/C, 10034 Chivasso (Italy); Ricciardi, Serena [Politecnico di Torino, Department of Applied Science and Technology, C.so Duca degli Abruzzi 24, 10129 Torino (Italy); Magnacca, Giuliana [University of Torino, Department of Chemistry and NIS Centre, Via P. Giuria 7, 10125 Torino (Italy)

    2016-08-01

    In order to confer adhesive properties to commercial polypropylene (PP) meshes, a surface plasma-induced deposition of poly-(acrylic acid) (PPAA) is performed. Once biomaterials were functionalized, different post-deposition treatments (i.e. water washing and/or thermal treatments) were investigated with the aim of monitoring the coating degradation (and therefore the loss of adhesion) after 3 months of aging in both humid/oxidant (air) and inert (nitrogen) atmospheres. A wide physicochemical characterization was carried out in order to evaluate the functionalization effectiveness and the adhesive coating homogeneity by means of static water drop shape analysis and several spectroscopies (namely, FTIR, UV–Visible and X-ray Photoemission Spectroscopy). The modification of the adhesion properties after post-deposition treatments as well as aging under different storage atmospheres were investigated by means of Atomic Force Microscopy (AFM) used in Force/Distance (F/D) mode. This technique confirms itself as a powerful tool for unveiling the surface adhesion capacity as well as the homogeneity of the functional coatings along the fibers. Results obtained evidenced that post-deposition treatments are mandatory in order to remove all oligomers produced during the plasma-treatment, whereas aging tests evidenced that these devices can be simply stored in presence of air for at least three months without a meaningful degradation of the original properties. - Highlights: • Plasma polymerized surface functionalization of hernia-repair meshes was used to confer adhesive properties. • The stability of the adhesive coating was verified under different post-deposition conditions. • The use of AFM in F/D mode was selected to monitor the coating degradation.

  4. Heteroepitaxial growth of In-face InN on GaN (0001) by plasma-assisted molecular-beam epitaxy

    International Nuclear Information System (INIS)

    Dimakis, E.; Iliopoulos, E.; Tsagaraki, K.; Kehagias, Th.; Komninou, Ph.; Georgakilas, A.

    2005-01-01

    The thermodynamic aspects of indium-face InN growth by radio frequency plasma-assisted molecular-beam epitaxy (rf-MBE) and the nucleation of InN on gallium-face GaN (0001) surface were investigated. The rates of InN decomposition and indium desorption from the surface were measured in situ using reflected high-energy electron diffraction and the rf-MBE 'growth window' of In-face InN (0001) was identified. It is shown that sustainable growth can be achieved only when the arrival rate of active nitrogen species on the surface is higher than the arrival rate of indium atoms. The maximum substrate temperature permitting InN growth as a function of the active nitrogen flux was determined. The growth mode of InN on Ga-face GaN (0001) surface was investigated by reflected high-energy electron diffraction and atomic force microscopy. It was found to be of the Volmer-Weber-type for substrate temperatures less than 350 deg. C and of the Stranski-Krastanov for substrate temperatures between 350 and 520 deg. C. The number of monolayers of initial two-dimensional growth, in the case of Stranski-Krastanov mode, varies monotonically with substrate temperature, from 2 ML at 400 deg. C to about 12 ML at 500 deg. C. The evolution and coalescence of nucleated islands were also investigated as a function of substrate temperature. It was found that at higher temperature their coalescence is inhibited leading to porous-columnar InN thin films, which exhibit growth rates higher than the nominal value. Therefore, in order to achieve continuous InN layers on GaN (0001) a two-step growth approach is introduced. In that approach, InN is nucleated at low temperatures on GaN and the growth continues until full coalescence of the nucleated islands. Subsequently, this nucleation layer is overgrown at higher substrate temperature in order to achieve high-quality continuous films. The InN films grown by the two-step method were investigated by x-ray diffraction, Hall-effect measurements, and

  5. Oxygen plasma assisted end-opening and field emission enhancement in vertically aligned multiwall carbon nanotubes

    International Nuclear Information System (INIS)

    Mathur, A.; Roy, S.S.; Hazra, K.S.; Wadhwa, S.; Ray, S.C.; Mitra, S.K.; Misra, D.S.; McLaughlin, J.A.

    2012-01-01

    Highlights: ► We showed Ar/O 2 plasma can be effective for the end opening of aligned CNTs. ► The field emission property was dramatically enhanced after plasma modification. ► Microstructures were clearly understood by Raman and SEM analysis. ► Surface wet-ability at various functionalised conditions was studied. - Abstract: This paper highlights the changes in micro-structural and field emission properties of vertically aligned carbon nanotubes (VACNTs) via oxygen plasma treatment. We find that exposure of very low power oxygen plasma (6 W) at 13.56 MHz for 15–20 min, opens the tip of vertically aligned CNTs. Scanning electron microscopy and transmission electron microscopy images were used to identify the quality and micro-structural changes of the nanotube morphology and surfaces. Raman spectra showed that the numbers of defects were increased throughout the oxygen plasma treatment process. In addition, the hydrophobic nature of the VACNTs is altered significantly and the contact angle decreases drastically from 110° to 40°. It was observed that the electron field emission (EFE) characteristics are significantly enhanced. The turn-on electric field (ETOE) of CNTs decreased from ∼0.80 V μm −1 (untreated) to ∼0.60 V μm −1 (oxygen treated). We believe that the open ended VACNTs would be immensely valuable for applications such as micro/nanofluidic based filtering elements and display devices.

  6. Mechanisms of plasma-assisted catalyzed growth of carbon nanofibres: a theoretical modeling

    Science.gov (United States)

    Gupta, R.; Sharma, S. C.; Sharma, R.

    2017-02-01

    A theoretical model is developed to study the nucleation and catalytic growth of carbon nanofibers (CNFs) in a plasma environment. The model includes the charging of CNFs, the kinetics of the plasma species (neutrals, ions and electrons), plasma pretreatment of the catalyst film, and various processes unique to a plasma-exposed catalyst surface such as adsorption of neutrals, thermal dissociation of neutrals, ion induced dissociation, interaction between neutral species, stress exerted by the growing graphene layers and the growth of CNFs. Numerical calculations are carried out for typical glow discharge plasma parameters. It is found that the growth rate of CNFs decreases with the catalyst nanoparticle size. In addition, the effect of hydrogen on the catalyst nanoparticle size, CNF tip diameter, CNF growth rate, and the tilt angle of the graphene layers to the fiber axis are investigated. Moreover, it is also found that the length of CNFs increases with hydrocarbon number density. Our theoretical findings are in good agreement with experimental observations and can be extended to enhance the field emission characteristics of CNFs.

  7. Rheumatoid factor (RF)

    Science.gov (United States)

    ... page: //medlineplus.gov/ency/article/003548.htm Rheumatoid factor (RF) To use the sharing features on this ... M. is also a founding member of Hi-Ethics and subscribes to the principles of the Health ...

  8. RF radiation safety handbook

    International Nuclear Information System (INIS)

    Kitchen, Ronald.

    1993-01-01

    Radio frequency radiation can be dangerous in a number of ways. Hazards include electromagnetic compatibility and interference, electro-explosive vapours and devices, and direct effects on the human body. This book is a general introduction to the sources and nature of RF radiation. It describes the ways in which our current knowledge, based on relevant safety standards, can be used to safeguard people from any harmful effects of RF radiation. The book is designed for people responsible for, or concerned with, safety. This target audience will primarily be radio engineers, but includes those skilled in other disciplines including medicine, chemistry or mechanical engineering. The book covers the problems of RF safety management, including the use of measuring instruments and methods, and a review of current safety standards. The implications for RF design engineers are also examined. (Author)

  9. Microbunching and RF Compression

    International Nuclear Information System (INIS)

    Venturini, M.; Migliorati, M.; Ronsivalle, C.; Ferrario, M.; Vaccarezza, C.

    2010-01-01

    Velocity bunching (or RF compression) represents a promising technique complementary to magnetic compression to achieve the high peak current required in the linac drivers for FELs. Here we report on recent progress aimed at characterizing the RF compression from the point of view of the microbunching instability. We emphasize the development of a linear theory for the gain function of the instability and its validation against macroparticle simulations that represents a useful tool in the evaluation of the compression schemes for FEL sources.

  10. Rf power sources

    International Nuclear Information System (INIS)

    Allen, M.A.

    1988-05-01

    This paper covers RF power sources for accelerator applications. The approach has been with particular customers in mind. These customers are high energy physicists who use accelerators as experimental tools in the study of the nucleus of the atom, and synchrotron light sources derived from electron or positron storage rings. This paper is confined to electron-positron linear accelerators since the RF sources have always defined what is possible to achieve with these accelerators. 11 refs., 13 figs

  11. Plasma assisted NO{sub x} reduction in existing coal combustors. Final report

    Energy Technology Data Exchange (ETDEWEB)

    Yao, S.C.; Russell, T.

    1991-12-31

    The feasibility of NO{sub x} reduction using plasma injection has been investigated. Both numerical and experimental methods were used in the development of this new NO{sub x}reduction technique. The numerical analysis was used to investigate various flow mechanisms in order to provide fundamental support in the development of this new NO{sub x} control technique. The calculations using this approach can give the information of the particle trajectories and distributions which are important for the design of the in-flame plasma injection configuration. The group model also established the necessary ground for further complete modeling of the whole process including the chemical kinetics. Numerical calculations were also performed for a turbulent gas flow field with variable properties. The results provided fundamental understanding of mixing effects encountered in the experiments at Pittsburgh Energy and Technology Center. A small scale experiment facility was designed and constructed at the heterogeneous combustion laboratory at Carnegie Mellon University. A series of tests were conducted in this setup to investigate the potential of the ammonia plasma injection for NO{sub x} reduction and parametric effects of this process. The experimental results are very promising. About 86% NO{sub x} reduction was achieved using ammonia radicals produced by argon plasma within the present test range. The total percentage of NO{sub x} reduction increases when ammonia flowrate, argon flow rate and initial NO concentration increase and when plasma power and the amount of excess air in the combustor decrease. A combined transport and reaction model was postulated for understanding the mechanism of NO{sub x} reduction using the plasma injection.

  12. Plasma-assisted partial oxidation of methane at low temperatures: numerical analysis of gas-phase chemical mechanism

    Energy Technology Data Exchange (ETDEWEB)

    Goujard, Valentin; Nozaki, Tomohiro; Yuzawa, Shuhei; Okazaki, Ken [Department of Mechanical and Control Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro, 1528552, Tokyo (Japan); Agiral, Anil, E-mail: tnozaki@mech.titech.ac.jp [Mesoscale Chemical Systems, MESA Institute for Nanotechnology, Faculty of Science and Technology, University of Twente, PO Box 217, 7500 AE, Enschede (Netherlands)

    2011-07-13

    Methane partial oxidation was investigated using a plasma microreactor. The experiments were performed at 5 and 300 deg. C. Microreactor configuration allows an efficient evacuation of the heat generated by methane partial oxidation and dielectric barrier discharges, allowing at the same time a better temperature control. At 5 deg. C, liquid condensation of low vapour pressure compounds, such as formaldehyde and methanol, occurs. {sup 1}H-NMR analysis allowed us to demonstrate significant CH{sub 3}OOH formation during plasma-assisted partial oxidation of methane. Conversion and product selectivity were discussed for both temperatures. In the second part of this work, a numerical simulation was performed and a gas-phase chemical mechanism was proposed and discussed. From the comparison between the experimental results and the simulation it was found that CH{sub 3}OO{center_dot} formation has a determinant role in oxygenated compound production, since its fast formation disfavoured radical recombination. At 5 deg. C the oxidation leads mainly towards oxygenated compound formation, and plasma dissociation was the major phenomenon responsible for CH{sub 4} conversion. At 300 deg. C, higher CH{sub 4} conversion resulted from oxidative reactions induced by {center_dot}OH radicals with a chemistry predominantly oxidative, producing CO, H{sub 2}, CO{sub 2} and H{sub 2}O.

  13. Aerosol Vacuum-Assisted Plasma Ionization (Aero-VaPI) Coupled to Ion Mobility-Mass Spectrometry

    Science.gov (United States)

    Blair, Sandra L.; Ng, Nga L.; Zambrzycki, Stephen C.; Li, Anyin; Fernández, Facundo M.

    2018-02-01

    In this communication, we report on the real-time analysis of organic aerosol particles by Vacuum-assisted Plasma Ionization-Mass Spectrometry (Aero-VaPI-MS) using a home-built VaPI ion source coupled to a Synapt G2-S HDMS ion mobility-mass spectrometry (IM-MS) system. Standards of organic molecules of interest in prebiotic chemistry were used to generate aerosols. Monocaprin and decanoic acid aerosol particles were successfully detected in both the positive and negative ion modes, respectively. A complex aerosol mixture of different sizes of polymers of L-malic acid was also examined through ion mobility (IM) separations, resulting in the detection of polymers of up to eight monomeric units. This noncommercial plasma ion source is proposed as a low cost alternative to other plasma ionization platforms used for aerosol analysis, and a higher-performance alternative to more traditional aerosol mass spectrometers. VaPI provides robust online ionization of organics in aerosols without extensive ion activation, with the coupling to IM-MS providing higher peak capacity and excellent mass accuracy. [Figure not available: see fulltext.

  14. RF Measurement Concepts

    CERN Document Server

    Caspers, F

    2014-01-01

    For the characterization of components, systems and signals in the radiofrequency (RF) and microwave ranges, several dedicated instruments are in use. In this article the fundamentals of the RF signal techniques are discussed. The key element in these front ends is the Schottky diode which can be used either as a RF mixer or as a single sampler. The spectrum analyser has become an absolutely indispensable tool for RF signal analysis. Here the front end is the RF mixer as the RF section of modern spectrum analyses has a ra ther complex architecture. The reasons for this complexity and certain working principles as well as limitations are discussed. In addition, an overview of the development of scalar and vector signal analysers is given. For the determination of the noise temperature of a one-port and the noise figure of a two-port, basic concepts and relations are shown as well as a brief discussion of commonly used noise-measurement techniques. In a further part of this article the operating principles of n...

  15. Microwave and plasma-assisted modification of composite fiber surface topography

    Science.gov (United States)

    Paulauskas, Felix L [Knoxville, TN; White, Terry L [Knoxville, TN; Bigelow, Timothy S [Knoxville, TN

    2003-02-04

    The present invention introduces a novel method for producing an undulated surface on composite fibers using plasma technology and microwave radiation. The undulated surface improves the mechanical interlocking of the fibers to composite resins and enhances the mechanical strength and interfacial sheer strength of the composites in which they are introduced.

  16. The mechanism of plasma-assisted penetration of NO2- in model tissues

    Science.gov (United States)

    He, Tongtong; Liu, Dingxin; Liu, Zhijie; Liu, Zhichao; Li, Qiaosong; Rong, Mingzhe; Kong, Michael G.

    2017-11-01

    Cold atmospheric plasmas are reportedly capable of enhancing the percutaneous absorption of drugs, which is a development direction of plasma medicine. This motivated us to study how the enhancement effect was realized. In this letter, gelatin gel films were used as surrogates of human tissues, NaNO2 was used as a representative of small-molecule drugs, and cross-field and linear-field plasma jets were used for the purpose of enhancing the penetration of NaNO2 through the gelatin gel films. The permeability of gelatin gel films was quantified by measuring the NO2- concentration in water which was covered by those films. It was found that the gas flow and electric field of cold plasmas played a crucial role in the permeability enhancement of the model tissues, but the effect of gas flow was mainly confined in the surface layer, while the effect of the electric field was holistic. Those effects might be attributed to the localized squeezing of particles by gas flow and the weakening of the ion-dipole interaction by the AC electric field. The enhancement effect decreases with the increasing mass fraction of gelatin because the macromolecules of gelatin could significantly hinder the penetration of small molecules in the model tissues.

  17. Simulations of planar non-thermal plasma assisted ignition at atmospheric pressure

    KAUST Repository

    Casey, Tiernan A.; Han, Jie; Belhi, Memdouh; Arias, Paul G.; Bisetti, Fabrizio; Im, Hong G.; Chen, Jyh Yuan

    2016-01-01

    neutrals and ions to the non-thermal electrons. A two-temperature plasma mechanism describing gas phase combustion, excitation of neutral species, and high-energy electron kinetics is employed to account for non-thermal effects. Charged species transported

  18. Flow reactor studies of non-equilibrium plasma-assisted oxidation of n-alkanes.

    Science.gov (United States)

    Tsolas, Nicholas; Lee, Jong Guen; Yetter, Richard A

    2015-08-13

    The oxidation of n-alkanes (C1-C7) has been studied with and without the effects of a nanosecond, non-equilibrium plasma discharge at 1 atm pressure from 420 to 1250 K. Experiments have been performed under nearly isothermal conditions in a flow reactor, where reactive mixtures are diluted in Ar to minimize temperature changes from chemical reactions. Sample extraction performed at the exit of the reactor captures product and intermediate species and stores them in a multi-position valve for subsequent identification and quantification using gas chromatography. By fixing the flow rate in the reactor and varying the temperature, reactivity maps for the oxidation of fuels are achieved. Considering all the fuels studied, fuel consumption under the effects of the plasma is shown to have been enhanced significantly, particularly for the low-temperature regime (T<800 K). In fact, multiple transitions in the rates of fuel consumption are observed depending on fuel with the emergence of a negative-temperature-coefficient regime. For all fuels, the temperature for the transition into the high-temperature chemistry is lowered as a consequence of the plasma being able to increase the rate of fuel consumption. Using a phenomenological interpretation of the intermediate species formed, it can be shown that the active particles produced from the plasma enhance alkyl radical formation at all temperatures and enable low-temperature chain branching for fuels C3 and greater. The significance of this result demonstrates that the plasma provides an opportunity for low-temperature chain branching to occur at reduced pressures, which is typically observed at elevated pressures in thermal induced systems. © 2015 The Author(s) Published by the Royal Society. All rights reserved.

  19. Oxygen plasma assisted end-opening and field emission enhancement in vertically aligned multiwall carbon nanotubes

    Energy Technology Data Exchange (ETDEWEB)

    Mathur, A. [NIBEC, School of Engineering, University of Ulster, Jordanstown, BT37 0QB (United Kingdom); Roy, S.S., E-mail: sinharoy@ualberta.ca [Department of Mechanical Engineering, University of Alberta, Edmonton, T6T 2G8 (Canada); Hazra, K.S. [Department of Physics, IIT Bombay, Powai, Mumbai-400076 (India); Wadhwa, S. [NIBEC, School of Engineering, University of Ulster, Jordanstown, BT37 0QB (United Kingdom); Ray, S.C. [School of Physics, University of the Witwatersrand, WITS 2050, Johannesburg (South Africa); Mitra, S.K. [Department of Mechanical Engineering, University of Alberta, Edmonton, T6T 2G8 (Canada); Misra, D.S. [Department of Physics, IIT Bombay, Powai, Mumbai-400076 (India); McLaughlin, J.A. [NIBEC, School of Engineering, University of Ulster, Jordanstown, BT37 0QB (United Kingdom)

    2012-05-15

    Highlights: Black-Right-Pointing-Pointer We showed Ar/O{sub 2} plasma can be effective for the end opening of aligned CNTs. Black-Right-Pointing-Pointer The field emission property was dramatically enhanced after plasma modification. Black-Right-Pointing-Pointer Microstructures were clearly understood by Raman and SEM analysis. Black-Right-Pointing-Pointer Surface wet-ability at various functionalised conditions was studied. - Abstract: This paper highlights the changes in micro-structural and field emission properties of vertically aligned carbon nanotubes (VACNTs) via oxygen plasma treatment. We find that exposure of very low power oxygen plasma (6 W) at 13.56 MHz for 15-20 min, opens the tip of vertically aligned CNTs. Scanning electron microscopy and transmission electron microscopy images were used to identify the quality and micro-structural changes of the nanotube morphology and surfaces. Raman spectra showed that the numbers of defects were increased throughout the oxygen plasma treatment process. In addition, the hydrophobic nature of the VACNTs is altered significantly and the contact angle decreases drastically from 110 Degree-Sign to 40 Degree-Sign . It was observed that the electron field emission (EFE) characteristics are significantly enhanced. The turn-on electric field (ETOE) of CNTs decreased from {approx}0.80 V {mu}m{sup -1} (untreated) to {approx}0.60 V {mu}m{sup -1} (oxygen treated). We believe that the open ended VACNTs would be immensely valuable for applications such as micro/nanofluidic based filtering elements and display devices.

  20. Microwave and RF assisted chemical vapor infiltration

    Energy Technology Data Exchange (ETDEWEB)

    Devlin, D.J.; Barbero, R.S. [Los Alamos National Laboratory, NM (United States)

    1995-05-01

    Work during this reporting period has focused on the development of a CVI technique for rapid production of carbon/carbon and alumina composite systems. The focus of the alumina effort is towards porous materials for membrane supports and hot gas filtration. Industrial interest in these applications include companies such as: Dow, Westinghouse, Amoco and DuPont. Applications for the carbon materials are numerous and include: brakes, sporting goods, biomedical materials, flaps and seals for thrust control, after burner nozzles, turbine engine flaps and rotors. This effort will focus on aircraft brakes. A collaboration is underway with Hitco a major producer of carbon/carbon materials.