Metal transfer during vacuum consumable arc remelting

International Nuclear Information System (INIS)

Zanner, F.J.

1977-11-01

A description of the vacuum consumable arc remelt process as related to solidification and a review of vacuum arc literature is presented. Metal transfer at arc lengths less than or equal to 3 cm was found to occur when liquid metal spikes hanging from the cathode form a low resistance bridge (drop short) by touching the anode and subsequently rupturing. During the bridge lifetime (0.0003 to 0.020 s) the arc is extinguished and all of the electrical power is directed through the molten bridge. The formation and rupture of these molten metal bridges are confirmed with electrical resistance measurements. At long arc lengths (greater than 10 cm) the spikes separate before touching the anode

Hot-rolling metals in vacuum. Information circular

International Nuclear Information System (INIS)

Beall, R.A.; Worthington, R.B.; Blickensderfer, R.

1979-01-01

The process of hot-rolling metals, alloys, and composites in vacuum is studied. First, a comprehensive review of the literature is presented, including the advantages and disadvantages of using vacuum. Next, details of hot-rolling titanium, chromium, and molybdenum-iron bimetal are given. Finally, the design of new equipment is described

All-metal vacuum chamber for the ZT-40 experiment

International Nuclear Information System (INIS)

Dike, R.S.; Downing, J.N.

1981-10-01

We discuss the design and fabrication of the all-metal vacuum chamber presently in use in the ZT-40 device. ZT-40 is the current experiment in the Los Alamos Reversed-Field Pinch (RFP) program. The new vessel, which replaces a ceramic one, is made of Inconel 625 and has major and minor diameters of 228 cm and 40 cm, respectively. It consists of 24 convoluted and straight sections welded into a single toroidal geometry. Presented are several design features showing diagnostic and vacuum port tubulations and thermal-electrical insulation isolating the unit from its conducting shell. We also discuss fabrication techniques and our procedure for cleaning and heat treatment designed to eliminate residual gas contamination in the Inconel material

High efficient vacuum arc plant for coating deposition

International Nuclear Information System (INIS)

Aksenov, I.I.; Belous, V.A.

2008-01-01

A number of progressive technical solutions are used in the 'Bulat-9' machine designed for vacuum arc coating deposition. The features of the machine are: a dome shaped working chamber that allows to 'wash' its inner surfaces with hot nitrogen or argon gas; a system of automatic loading/unloading of articles to be treated into the chamber through its bottom; shielding of the inner surfaces of the chamber by heated panels; improved vacuum arc plasma sources including filtered one; four ported power supply for the vacuum arc discharges; LC oscillatory circuits suppressing microarcs on the substrate; the system of automatic control of a working process. The said technical features cause the apparatus originality and novelty preserved up to-day

Efficient Phosphorescent OLEDS Based on Vacuum Deposition ...

African Journals Online (AJOL)

Thereby, we demonstrate high-efficiency organic light-emitting diodes by incorporating a double emission layer {i.e. both doped with the green phosphorescent dye tris(phenylpyridine)iridium [Ir(ppy)3]} into p-i-n-type device structure based on vacuum deposition technology. The intrinsic and doped transports layers are ...

Properties of DLC coatings deposited by dc and dc with superimposed pulsed vacuum arc

International Nuclear Information System (INIS)

Zavaleyev, V.; Walkowicz, J.; Aksyonov, D.S.; Luchaninov, A.A.; Reshetnyak, E.N.; Strel'nitskij, V.E.

2014-01-01

Comparative studies of the structure, mechanical and tribological properties of DLC coatings deposited in DC and DC with superimposed high current pulse modes of operation vacuum-arc plasma source with the graphite cathode are presented. Imposition the pulses of high current on DC vacuum-arc discharge allows both increase the deposition rate of DLC coating and reduce the residual compressive stress in the coatings what promotes substantial improvement the adhesion to the substrate. Effect of vacuum arc plasma filtration with Venetian blind filter on the deposition rate and tribological characteristics of the coatings analyzed.

Metal vapor vacuum arc ion sources

International Nuclear Information System (INIS)

Brown, I.G.; Dickinson, M.R.; Galvin, J.E.; Godechot, X.; MacGill, R.A.

1990-06-01

We have developed a family of metal vapor vacuum are (MEVVA) high current metal ion sources. The sources were initially developed for the production of high current beams of metal ions for heavy ion synchrotron injection for basic nuclear physics research; more recently they have also been used for metal ion implantation. A number of different embodiments of the source have been developed for these specific applications. Presently the sources operate in a pulsed mode, with pulse width of order 1 ms and repetition rate up to 100 pps. Beam extraction voltage is up to 100 kV, and since the ions produced in the vacuum arc plasma are in general multiply ionized the ion energy is up to several hundred keV. Beam current is up to several Amperes peak and around 10 mA time averaged delivered onto target. Nearly all of the solid metals of the Periodic Table have been use to produce beam. A number of novel features have been incorporated into the sources, including multiple cathodes and the ability to switch between up to 18 separate cathode materials simply and quickly, and a broad beam source version as well as miniature versions. here we review the source designs and their performance. 45 refs., 7 figs

Behaviour of gas conditions during vacuum arc discharges used for deposition of thin films

International Nuclear Information System (INIS)

Strzyzewski, J.; Langner, J.; Sadowski, M.; Witkowski, J.; Mirowski, R.; Catani, L.; Cianchi, A.; Russo, R.; Tazzari, S.

2005-01-01

The vacuum arc, which is one of the oldest techniques used for the deposition of thin films, is now widely used for the Plasma Immersion Ion Implantation and Deposition (PIII and D) in laboratory and industry. Despite of high progress in this field observed during last three decades, involving e.g. magnetic filters for the elimination of micro-droplets, some problems have not been resolved so far. The paper concerns an important problem which is connected with the inclusion of some impurities in the deposited metal film. It was found that appearance of contaminants in the film is induced mainly by water vapour remnants inside the vacuum chamber. The high adsorption of such contaminants by the deposited thin films is observed particularly in so-called getter materials, as niobium and titanium. Such materials can absorb impurities from the surrounding and dissolve them inside the layer. In order to eliminate this problem, in 2000 a new approach was proposed to perform arc discharges at the ultra-high vacuum (UHV) conditions. It was demonstrated experimentally that the deposited pure Nb-films have similar properties to the bulk-Nb samples. These results are very promising from the point of the application of such coating processes in super-conducting RF cavities of future charged-particle accelerators. The paper describes different methods used for the reduction of the background pressure in the UHV stand below 10 -10 hPa. The most important methods involve the selection of appropriate materials and the backing of whole vacuum system. In order to reduce the contaminants a laser triggering system has been applied instead of a common system, which used high-voltage discharges along the surface of an insulated trigger electrode. Particular attention is paid to a comparison of different gas conditions during arc discharges at high-vacuum conditions (background pressure in the range of 10 -8 -10 -7 hPa) and at UHV experiments (background pressure within the range of 10 -11

DC switch power supply for vacuum-arc coatings deposition

International Nuclear Information System (INIS)

Zalesskij, D.Yu.; Volkov, Yu.Ya.; Vasil'ev, V.V.; Kozhushko, V.V.; Luchaninov, A.A.; Strel'nitskij, V.E.

2008-01-01

Special DC Switch Power Supply for vacuum-arc deposition was developed and tested in the mode of depositing Al and AlN films. Maximum output power was 6 kW, maximum output current - 120 A, open-circuit voltage - 150 V. The Power Supply allows to adjust and stabilize output current in a wide range. Testing of the Power Supply revealed an advantages over the standard 'Bulat-6' power supply, especially for deposition of non-conductive AlN films.

Casimir Repulsion between Metallic Objects in Vacuum

International Nuclear Information System (INIS)

Levin, Michael; McCauley, Alexander P.; Rodriguez, Alejandro W.; Reid, M. T. Homer; Johnson, Steven G.

2010-01-01

We give an example of a geometry in which two metallic objects in vacuum experience a repulsive Casimir force. The geometry consists of an elongated metal particle centered above a metal plate with a hole. We prove that this geometry has a repulsive regime using a symmetry argument and confirm it with numerical calculations for both perfect and realistic metals. The system does not support stable levitation, as the particle is unstable to displacements away from the symmetry axis.

Comparative study of tantalum deposition by chemical vapor deposition and electron beam vacuum evaporation

International Nuclear Information System (INIS)

Spitz, J.; Chevallier, J.

1975-01-01

The coating by tantalum of steel parts has been carried out by the two following methods: chemical vapor deposition by hydrogen reduction of TaCl 5 (temperature=1100 deg C, pressure=200 mmHg, H 2 /TaCl 5 =10); electron beam vacuum evaporation. In this case Ta was firstly condensed by ion plating (P(Ar)=5x10 -3 up to 2x10 -2 mmHg; U(c)=3 to -4kV and J(c)=0.2 to 1mAcm -2 ) in order to ensure a good adhesion between deposit and substrate; then by vacuum condensation (substrate temperature: 300 to 650 deg C) to ensure that the coating is impervious to HCl an H 2 SO 4 acids. The advantages and inconveniences of each method are discussed [fr

Protective coating of inner surface of steel tubes via vacuum arc deposition

Energy Technology Data Exchange (ETDEWEB)

Maile, K.; Roos, E.; Lyutovich, A.; Boese, J.; Itskov, M. [Stuttgart Univ. (DE). Materialpruefungsanstalt (MPA); Ashurov, Kh.; Mirkarimov, A.; Kazantsev, S.; Kadirov, Kh. [Uzbek Academy of Science, Tashkent (Uzbekistan). Arifov Inst. of Electronics

2010-07-01

The Vacuum Arc Deposition (VAD) technique based on sputtering a chosen electrode material and its deposition via plasma allows highly-productive technology for creating a wide class of protecting coatings on complex structures. In this work, VAD was applied as a method for the protection of the inner surface of tubes for power-plant boilers against steam oxidation. For this aim, a source cathode of an alloy with high chromium and nickel content was employed in two different VAD treatment systems: a horizontal vacuum chamber (MPA) and a vertical system where the work-piece of the tubes to be protected served as a vacuum changer (Arifov Institute of Electronics). Surface coating with variation of deposition parameters and layer thickness was performed. Characterisation of coated tubes has shown that the method realised in this work allows attainment of material transfer from the cathode to the inner surface with nearly equal chemical composition. It was demonstrated that the initial martensitic structure of the tubes was kept after the vacuum-arc treatment which can provide for both the high mechanical robustness and the corrosion-resistance of the final material. (orig.)

Upgraded vacuum arc ion source for metal ion implantation

International Nuclear Information System (INIS)

Nikolaev, A. G.; Oks, E. M.; Savkin, K. P.; Yushkov, G. Yu.; Brown, I. G.

2012-01-01

Vacuum arc ion sources have been made and used by a large number of research groups around the world over the past twenty years. The first generation of vacuum arc ion sources (dubbed ''Mevva,'' for metal vapor vacuum arc) was developed at Lawrence Berkeley National Laboratory in the 1980s. This paper considers the design, performance parameters, and some applications of a new modified version of this kind of source which we have called Mevva-V.Ru. The source produces broad beams of metal ions at an extraction voltage of up to 60 kV and a time-averaged ion beam current in the milliampere range. Here, we describe the Mevva-V.Ru vacuum arc ion source that we have developed at Tomsk and summarize its beam characteristics along with some of the applications to which we have put it. We also describe the source performance using compound cathodes.

Electrospray deposition of fullerenes in ultra-high vacuum: in situ scanning tunneling microscopy and photoemission spectroscopy

International Nuclear Information System (INIS)

Satterley, Christopher J; Perdigao, LuIs M A; Saywell, Alex; Magnano, Graziano; Rienzo, Anna; Mayor, Louise C; Dhanak, Vinod R; Beton, Peter H; O'Shea, James N

2007-01-01

Electrospray deposition of fullerenes on gold has been successfully observed by in situ room temperature scanning tunneling microscopy and photoemission spectroscopy. Step-edge decoration and hexagonal close-packed islands with a periodicity of 1 nm are observed at low and multilayer coverages respectively, in agreement with thermal evaporation studies. Photoemission spectroscopy shows that fullerenes are being deposited in high purity and are coupling to the gold surface as for thermal evaporation. These results open a new route for the deposition of thermally labile molecules under ultra-high vacuum conditions for a range of high resolution surface science techniques

Vapour and electro-deposited metal films on copper: structure and reactivity

OpenAIRE

McEvoy, Thomas F.

2004-01-01

The systems studied involve deposition of metals of a larger atomic diameter on a Cu{100} single crystal surface under vacuum and determining the structures formed along with the effect on the Cu{100} substrate. Cu microelectrodes were fabricated and characterised with Indium electrodeposited on the electrode surface. The In on Cu{ 100} growth mode is compared with the growth mode of electrodeposited Indium on Cu microelectrodes. The Cu{100}/In system has been studied for the In coverage ...

Obtention of thin depositions by the vacuum evaporation technique

International Nuclear Information System (INIS)

Gonzalez Mateu, D.; Labrada, A.; Voronin, A.

1991-01-01

The vacuum evaporating technique used to prepare thin depositions, and the technical characteristics of the constructed installation are described. 235 U y 238 U nuclear target for the fission researches were obtained. Aluminium and gold self-supporting foils were obtained too

Cermet insert high voltage holdoff for ceramic/metal vacuum devices

Science.gov (United States)

Ierna, William F.

1987-01-01

An improved metal-to-ceramic seal is provided wherein the ceramic body of the seal contains an integral region of cermet material in electrical contact with the metallic member, e.g., an electrode, of the seal. The seal is useful in high voltage vacuum devices, e.g., vacuum switches, and increases the high-voltage holdoff capabilities of such devices. A method of fabricating such seals is also provided.

High rate deposition of transparent conducting oxide thin films by vacuum arc plasma evaporation

International Nuclear Information System (INIS)

Minami, Tadatsugu; Ida, Satoshi; Miyata, Toshihiro

2002-01-01

Transparent conducting oxide (TCO) thin films have been deposited at a high rate above 370 nm/min by vacuum arc plasma evaporation (VAPE) using sintered oxide fragments as the source material. It was found that the deposition rate of TCO films was strongly dependent on the deposition pressure, whereas the obtained electrical properties were relatively independent of the pressure. Resistivities of 5.6x10 -4 and 2.3x10 -4 Ω·cm and an average transmittance above 80% (with substrate included) in the visible range were obtained in Ga-doped ZnO (GZO) thin films deposited at 100 and 350 deg. C, respectively. In addition, a resistivity as low as 1.4x10 -4 Ω·cm and an average transmittance above 80% were also obtained in indium-tin-oxide (ITO) films deposited at 300 deg. C. The deposited TCO films exhibited uniform distributions of resistivity and thickness on large area substrates

High rate deposition of transparent conducting oxide thin films by vacuum arc plasma evaporation

Energy Technology Data Exchange (ETDEWEB)

Minami, Tadatsugu; Ida, Satoshi; Miyata, Toshihiro

2002-09-02

Transparent conducting oxide (TCO) thin films have been deposited at a high rate above 370 nm/min by vacuum arc plasma evaporation (VAPE) using sintered oxide fragments as the source material. It was found that the deposition rate of TCO films was strongly dependent on the deposition pressure, whereas the obtained electrical properties were relatively independent of the pressure. Resistivities of 5.6x10{sup -4} and 2.3x10{sup -4} {omega}{center_dot}cm and an average transmittance above 80% (with substrate included) in the visible range were obtained in Ga-doped ZnO (GZO) thin films deposited at 100 and 350 deg. C, respectively. In addition, a resistivity as low as 1.4x10{sup -4} {omega}{center_dot}cm and an average transmittance above 80% were also obtained in indium-tin-oxide (ITO) films deposited at 300 deg. C. The deposited TCO films exhibited uniform distributions of resistivity and thickness on large area substrates.

Coefficient of electrical transport vacuum arc for metals and alloys

International Nuclear Information System (INIS)

Markov, G.V.; Ehjzner, B.A.

1998-01-01

In this article the authors propose formulas for estimation coefficient of electrical transport vacuum arc for metals and alloys. They also represent results of analysis principal physical processes which take place in cathode spot vacuum arc

Comparative study of post-growth annealing of Cu(hfac)2, Co2(CO)8 and Me2Au(acac) metal precursors deposited by FEBID.

Science.gov (United States)

Puydinger Dos Santos, Marcos Vinicius; Szkudlarek, Aleksandra; Rydosz, Artur; Guerra-Nuñez, Carlos; Béron, Fanny; Pirota, Kleber Roberto; Moshkalev, Stanislav; Diniz, José Alexandre; Utke, Ivo

2018-01-01

, Cu and Au deposits turned into nanocrystalline graphite with comparable crystal sizes of 12-14 nm at 300 °C annealing temperature. However, we observed a more effective formation of graphite clusters in Co- than in Cu- and Au-containing deposits. The graphitisation has a minor influence on the electrical conductivity improvements of Co-C deposits, which is attributed to the high as-deposited Co content and the related metal grain percolation. On the contrary, electrical conductivity improvements by factors of 30 and 12 for, respectively, Cu-C and Au-C deposits with low metal content are mainly attributed to the graphitisation. This relatively simple vacuum-based post-growth annealing protocol may be useful for other precursors as it proved to be efficient in reliably tuning the electrical properties of as-deposited FEBID materials. Finally, a H 2 -assisted gold purification protocol is demonstrated at temperatures around 300 °C by fully removing the carbon matrix and drastically reducing the electrical resistance of the deposit.

Comparison of vacuum metal deposition and 1,2-indandione/ninhydrin reagent method for the development of fingerprints on renminbi

Directory of Open Access Journals (Sweden)

Cong Wang

2017-01-01

Full Text Available It is extremely difficult to develop fingerprints from the surface of currency. There are studies reporting that the high vacuum metal deposition (VMD method can be used to detect fingerprints on certain types of currency notes. Both VMD and 1,2-indandione/ninhydrin techniques are employed to visualize latent fingermarks on porous surfaces, such as paper. The current study explores whether the VMD method or 1,2-indandione/ninhydrin reagent method is more effective in the development of fingerprints on renminbi (RMB. Uncirculated, circulated, and water-exposed RMB was utilized in this study, along with five donors who ranged in their age and potential to leave fingermarks. Samples were aged for a determined period (for uncirculated and circulated RMB, times were 1, 3, 5, 10, and 35 days; for water-exposed RMB, exposure time was 1 day and then treated with VMD and 1,2-indandione/ninhydrin. The results suggested that the 1,2-indandione/ninhydrin reagent yielded a better effect for both circulated and uncirculated RMB. For the RMB exposed to water, VMD performed better and gave limited results in terms of fingerprint development, which could serve as a reference for actual forensic cases.

Lanthanoid titanate film structure deposited at different temperatures in vacuum

International Nuclear Information System (INIS)

Kushkov, V.D.; Zaslavskij, A.M.; Mel'nikov, A.V.; Zverlin, A.V.; Slivinskaya, A.Eh.

1991-01-01

Influence of deposition temperature on the structure of lanthanoid titanate films, prepared by the method of high-rate vacuum condensation. It is shown that formation of crystal structure, close to equilibrium samples, proceeds at 1100-1300 deg C deposition temperatures. Increase of temperature in this range promotes formation of films with higher degree of structural perfection. Amorphous films of lanthanoid titanates form at 200-1000 deg C. Deposition temperature shouldn't exceed 1400 deg C to prevent the formation of perovskite like phases in films

Next generation non-vacuum, maskless, low temperature nanoparticle ink laser digital direct metal patterning for a large area flexible electronics.

Science.gov (United States)

Yeo, Junyeob; Hong, Sukjoon; Lee, Daehoo; Hotz, Nico; Lee, Ming-Tsang; Grigoropoulos, Costas P; Ko, Seung Hwan

2012-01-01

Flexible electronics opened a new class of future electronics. The foldable, light and durable nature of flexible electronics allows vast flexibility in applications such as display, energy devices and mobile electronics. Even though conventional electronics fabrication methods are well developed for rigid substrates, direct application or slight modification of conventional processes for flexible electronics fabrication cannot work. The future flexible electronics fabrication requires totally new low-temperature process development optimized for flexible substrate and it should be based on new material too. Here we present a simple approach to developing a flexible electronics fabrication without using conventional vacuum deposition and photolithography. We found that direct metal patterning based on laser-induced local melting of metal nanoparticle ink is a promising low-temperature alternative to vacuum deposition- and photolithography-based conventional metal patterning processes. The "digital" nature of the proposed direct metal patterning process removes the need for expensive photomask and allows easy design modification and short turnaround time. This new process can be extremely useful for current small-volume, large-variety manufacturing paradigms. Besides, simple, scalable, fast and low-temperature processes can lead to cost-effective fabrication methods on a large-area polymer substrate. The developed process was successfully applied to demonstrate high-quality Ag patterning (2.1 µΩ·cm) and high-performance flexible organic field effect transistor arrays.

Next generation non-vacuum, maskless, low temperature nanoparticle ink laser digital direct metal patterning for a large area flexible electronics.

Directory of Open Access Journals (Sweden)

Junyeob Yeo

Full Text Available Flexible electronics opened a new class of future electronics. The foldable, light and durable nature of flexible electronics allows vast flexibility in applications such as display, energy devices and mobile electronics. Even though conventional electronics fabrication methods are well developed for rigid substrates, direct application or slight modification of conventional processes for flexible electronics fabrication cannot work. The future flexible electronics fabrication requires totally new low-temperature process development optimized for flexible substrate and it should be based on new material too. Here we present a simple approach to developing a flexible electronics fabrication without using conventional vacuum deposition and photolithography. We found that direct metal patterning based on laser-induced local melting of metal nanoparticle ink is a promising low-temperature alternative to vacuum deposition- and photolithography-based conventional metal patterning processes. The "digital" nature of the proposed direct metal patterning process removes the need for expensive photomask and allows easy design modification and short turnaround time. This new process can be extremely useful for current small-volume, large-variety manufacturing paradigms. Besides, simple, scalable, fast and low-temperature processes can lead to cost-effective fabrication methods on a large-area polymer substrate. The developed process was successfully applied to demonstrate high-quality Ag patterning (2.1 µΩ·cm and high-performance flexible organic field effect transistor arrays.

Vacuum evaporation of pure metals

OpenAIRE

Safarian, Jafar; Engh, Thorvald Abel

2013-01-01

Theories on the evaporation of pure substances are reviewed and applied to study vacuum evaporation of pure metals. It is shown that there is good agreement between different theories for weak evaporation, whereas there are differences under intensive evaporation conditions. For weak evaporation, the evaporation coefficient in Hertz-Knudsen equation is 1.66. Vapor velocity as a function of the pressure is calculated applying several theories. If a condensing surface is less than one collision...

Analysis of Zinc 65 Contamination after Vacuum Thermal Process

International Nuclear Information System (INIS)

Korinko, Paul S.; Tosten, Michael H.

2013-01-01

Radioactive contamination with a gamma energy emission consistent with 65 Zn was detected in a glovebox following a vacuum thermal process. The contaminated components were removed from the glovebox and subjected to examination. Selected analytical techniques were used to determine the nature of the precursor material, i.e., oxide or metallic, the relative transferability of the deposit and its nature. The deposit was determined to be borne from natural zinc and was further determined to be deposited as a metallic material from vapor

Cermet insert high voltage holdoff improvement for ceramic/metal vacuum devices

Science.gov (United States)

Ierna, W.F.

1986-03-11

An improved metal-to-ceramic seal is provided wherein the ceramic body of the seal contains an integral region of cermet material in electrical contact with the metallic member, e.g., an electrode, of the seal. The seal is useful in high voltage vacuum devices, e.g., vacuum switches, and increases the high-voltage holdoff capabilities of such devices. A method of fabricating such seals is also provided.

Distribution of metals in vacuum residuums, asphaltenes and maltenes by PIXE

International Nuclear Information System (INIS)

Romero G, E.T.; Camacho M, V.; Sanchez B, A.C.; Lopez M, J.; Ramirez T, J.J.; Villasenor S, P.; Aspiazu F, J.A.

2001-01-01

The PIXE technique for determining directly the distribution and abundance of trace metals in vacuum residuum, asphaltenes and maltenes separated with n-alkanes (C 5 -C 8 ) is used. The metal content of petroleum derivatives revealed that the vacuum residuum contains iron, aluminium, vanadium and nickel mainly, while that the asphaltenes and maltenes maintain inside of their composition only preferably the vanadium and nickel as majority elements. (Author)

Contamination due to memory effects in filtered vacuum arc plasma deposition systems

CERN Document Server

Martins, D R; Verdonck, P; Brown, I G

2002-01-01

Thin film synthesis by filtered vacuum arc plasma deposition is a widely used technique with a number of important emerging technological applications. A characteristic feature of the method is that during the deposition process not only is the substrate coated by the plasma, but the plasma gun itself and the magnetic field coil and/or vacuum vessel section constituting the macroparticle filter are also coated to some extent. If then the plasma gun cathode is changed to a new element, there can be a contamination of the subsequent film deposition by sputtering from various parts of the system of the previous coating species. We have experimentally explored this effect and compared our results with theoretical estimates of sputtering from the SRIM (Stopping and Range of Ions in Matter) code. We find film contamination of order 10-4 - 10-3, and the memory of the prior history of the deposition hardware can be relatively long-lasting.

Contamination due to memory effects in filtered vacuum arc plasma deposition systems

International Nuclear Information System (INIS)

Martins, D.R.; Salvadori, M.C.; Verdonck, P.; Brown, I.G.

2002-01-01

Thin film synthesis by filtered vacuum arc plasma deposition is a widely used technique with a number of important emerging technological applications. A characteristic feature of the method is that during the deposition process not only is the substrate coated by the plasma, but the plasma gun itself and the magnetic field coil and/or vacuum vessel section constituting the macroparticle filter are also coated to some extent. If then the plasma gun cathode is changed to a new element, there can be a contamination of the subsequent film deposition by sputtering from various parts of the system of the previous coating species. We have experimentally explored this effect and compared our results with theoretical estimates of sputtering from the stopping and range of ions in matter code. We find film contamination of the order of 10 -4 -10 -3 , and the memory of the prior history of the deposition hardware can be relatively long lasting

Contamination due to memory effects in filtered vacuum arc plasma deposition systems

Energy Technology Data Exchange (ETDEWEB)

Martins, D.R.; Salvadori, M.C.; Verdonck, P.; Brown, I.G.

2002-08-13

Thin film synthesis by filtered vacuum arc plasma deposition is a widely used technique with a number of important emerging technological applications. A characteristic feature of the method is that during the deposition process not only is the substrate coated by the plasma, but the plasma gun itself and the magnetic field coil and/or vacuum vessel section constituting the macroparticle filter are also coated to some extent. If then the plasma gun cathode is changed to a new element, there can be a contamination of the subsequent film deposition by sputtering from various parts of the system of the previous coating species. We have experimentally explored this effect and compared our results with theoretical estimates of sputtering from the SRIM (Stopping and Range of Ions in Matter) code. We find film contamination of order 10-4 - 10-3, and the memory of the prior history of the deposition hardware can be relatively long-lasting.

Installation for vacuum vapour deposition of nickel, more particularly for manufacturing neutron guides

International Nuclear Information System (INIS)

Samuel, F.

1986-01-01

The present invention proposes an installation for vacuum vapour deposition of Ni of the type including in a vacuum chamber a device for heating a mass of at least one Ni isotope to be evaporated, and a surface to be covered with deposited Ni facing the heater, is claimed, in which the heater includes a ribbon of W conformed in a middle part into a container in which is placed a refractory crucible in which is placed the Ni to be evaporated, and adapted to be connected at two terminal zones to an electrical circuit. The crucible is Al203. The invention finds an application in neutron guide fabrication, more particularly for Ni58 vapour deposition on the surfaces of the neutron guide [fr

Carbon nanotubes and nanofibers synthesized by CVD on nickel coatings deposited with a vacuum arc

Energy Technology Data Exchange (ETDEWEB)

Escobar, M. [LP and MC, Dep. de Fisica-FCEyN-UBA, Cdad. Universitaria Pab.1, (1428), Buenos Aires (Argentina); DQIAQF-FCEyN-UBA, Cdad. Universitaria Pab.1, (1428), Buenos Aires (Argentina); Giuliani, L. [INFIP, CONICET, Dep. de Fisica, FCEyN-UBA, Cdad. Univ. Pab.1, (1428), Buenos Aires (Argentina); Candal, R.J. [INQUIMAE-FCEyN-UBA, Cdad. Universitaria Pab.2, (1428), Buenos Aires (Argentina); Lamas, D.G. [CINSO, CITEFA, CONICET, J.B. de La Salle 4397, (1603) V.Martelli, Buenos Aires (Argentina); Caso, A. [LP and MC, Dep. de Fisica-FCEyN-UBA, Cdad. Universitaria Pab.1, (1428), Buenos Aires (Argentina); Rubiolo, G. [LP and MC, Dep. de Fisica-FCEyN-UBA, Cdad. Universitaria Pab.1, (1428), Buenos Aires (Argentina); UAM-CNEA, Av. Gral Paz 1499, (1650) San Martin, Buenos Aires (Argentina); Grondona, D. [INFIP, CONICET, Dep. de Fisica, FCEyN-UBA, Cdad. Univ. Pab.1, (1428), Buenos Aires (Argentina); Goyanes, S. [LP and MC, Dep. de Fisica-FCEyN-UBA, Cdad. Universitaria Pab.1, (1428), Buenos Aires (Argentina); Marquez, A., E-mail: amarquez@df.uba.a [INFIP, CONICET, Dep. de Fisica, FCEyN-UBA, Cdad. Univ. Pab.1, (1428), Buenos Aires (Argentina)

2010-04-16

Nanotubes and nanofibers were grown on Ni coatings deposited by plasma generated with a pulsed vacuum arc on silicon wafers using three different bias conditions: at floating potential (approximately +30 V respect to the grounded cathode); at ground potential; and at -60 V. An atomic force microscopy study showed that the Ni film morphology was affected by the bias condition of the substrate. The morphology of carbonaceous species depended on Ni-films characteristics. FE-SEM and TEM analyses have shown that nanofibers growth was favoured on Ni coatings deposited at -60 V whereas nanotubes grew mainly on Ni coatings obtained at floating and ground potentials. Hence, this new method to produce the precursor can be optimized to obtain nanotubes or nanofibers varying the substrate bias for the Ni deposition.

A high-current pulsed cathodic vacuum arc plasma source

International Nuclear Information System (INIS)

Oates, T.W.H.; Pigott, J.; Mckenzie, D.R.; Bilek, M.M.M.

2003-01-01

Cathodic vacuum arcs (CVAs) are well established as a method for producing metal plasmas for thin film deposition and as a source of metal ions. Fundamental differences exist between direct current (dc) and pulsed CVAs. We present here results of our investigations into the design and construction of a high-current center-triggered pulsed CVA. Power supply design based on electrolytic capacitors is discussed and optimized based on obtaining the most effective utilization of the cathode material. Anode configuration is also discussed with respect to the optimization of the electron collection capability. Type I and II cathode spots are observed and discussed with respect to cathode surface contamination. An unfiltered deposition rate of 1.7 nm per pulse, at a distance of 100 mm from the source, has been demonstrated. Instantaneous plasma densities in excess of 1x10 19 m -3 are observed after magnetic filtering. Time averaged densities an order of magnitude greater than common dc arc densities have been demonstrated, limited by pulse repetition rate and filter efficiency

Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition

Directory of Open Access Journals (Sweden)

Yu-Kuang Liao

2017-04-01

Full Text Available Most thin-film techniques require a multiple vacuum process, and cannot produce high-coverage continuous thin films with the thickness of a few nanometers on rough surfaces. We present a new ”paradigm shift” non-vacuum process to deposit high-quality, ultra-thin, single-crystal layers of coalesced sulfide nanoparticles (NPs with controllable thickness down to a few nanometers, based on thermal decomposition. This provides high-coverage, homogeneous thickness, and large-area deposition over a rough surface, with little material loss or liquid chemical waste, and deposition rates of 10 nm/min. This technique can potentially replace conventional thin-film deposition methods, such as atomic layer deposition (ALD and chemical bath deposition (CBD as used by the Cu(In,GaSe2 (CIGS thin-film solar cell industry for decades. We demonstrate 32% improvement of CIGS thin-film solar cell efficiency in comparison to reference devices prepared by conventional CBD deposition method by depositing the ZnS NPs buffer layer using the new process. The new ZnS NPs layer allows reduction of an intrinsic ZnO layer, which can lead to severe shunt leakage in case of a CBD buffer layer. This leads to a 65% relative efficiency increase.

An ultrahigh vacuum, low-energy ion-assisted deposition system for III-V semiconductor film growth

Science.gov (United States)

Rohde, S.; Barnett, S. A.; Choi, C.-H.

1989-06-01

A novel ion-assisted deposition system is described in which the substrate and growing film can be bombarded with high current densities (greater than 1 mA/sq cm) of very low energy (10-200 eV) ions. The system design philosophy is similar to that used in III-V semiconductor molecular-beam epitaxy systems: the chamber is an all-metal ultrahigh vacuum system with liquid-nitrogen-cooled shrouds, Knudsen-cell evaporation sources, a sample insertion load-lock, and a 30-kV reflection high-energy electron diffraction system. III-V semiconductor film growth is achieved using evaporated group-V fluxes and group-III elemental fluxes sputtered from high-purity targets using ions extracted from a triode glow discharge. Using an In target and an As effusion cell, InAs deposition rates R of 2 microns/h have been obtained. Epitaxial growth of InAs was observed on both GaSb(100) and Si(100) substrates.

Laboratory model study of newly deposited dredger fills using improved multiple-vacuum preloading technique

Directory of Open Access Journals (Sweden)

Jingjin Liu

2017-10-01

Full Text Available Problems continue to be encountered concerning the traditional vacuum preloading method in field during the treatment of newly deposited dredger fills. In this paper, an improved multiple-vacuum preloading method was developed to consolidate newly dredger fills that are hydraulically placed in seawater for land reclamation in Lingang Industrial Zone of Tianjin City, China. With this multiple-vacuum preloading method, the newly deposited dredger fills could be treated effectively by adopting a novel moisture separator and a rapid improvement technique without sand cushion. A series of model tests was conducted in the laboratory for comparing the results from the multiple-vacuum preloading method and the traditional one. Ten piezometers and settlement plates were installed to measure the variations in excess pore water pressures and moisture content, and vane shear strength was measured at different positions. The testing results indicate that water discharge–time curves obtained by the traditional vacuum preloading method can be divided into three phases: rapid growth phase, slow growth phase, and steady phase. According to the process of fluid flow concentrated along tiny ripples and building of larger channels inside soils during the whole vacuum loading process, the fluctuations of pore water pressure during each loading step are divided into three phases: steady phase, rapid dissipation phase, and slow dissipation phase. An optimal loading pattern which could have a best treatment effect was proposed for calculating the water discharge and pore water pressure of soil using the improved multiple-vacuum preloading method. For the newly deposited dredger fills at Lingang Industrial Zone of Tianjin City, the best loading step was 20 kPa and the loading of 40–50 kPa produced the highest drainage consolidation. The measured moisture content and vane shear strength were discussed in terms of the effect of reinforcement, both of which indicate

Surface Finish after Laser Metal Deposition

Science.gov (United States)

Rombouts, M.; Maes, G.; Hendrix, W.; Delarbre, E.; Motmans, F.

Laser metal deposition (LMD) is an additive manufacturing technology for the fabrication of metal parts through layerwise deposition and laser induced melting of metal powder. The poor surface finish presents a major limitation in LMD. This study focuses on the effects of surface inclination angle and strategies to improve the surface finish of LMD components. A substantial improvement in surface quality of both the side and top surfaces has been obtained by laser remelting after powder deposition.

Proceedings of the workshop on vacuum arc ion sources

International Nuclear Information System (INIS)

Brown, I.

1996-08-01

Topics included in the papers presented at this conference are: vacuum arc ion source development at GSI (Gesellschaft fuer Schwerionenforschung, Germany), ITEP (Institute for Theoretical and Experimental Physics, Russia), Lawrence Berkeley Laboratory, and ANSTO (Australian Nuclear Science and Technology Organization); triggers for vacuum arc sources; plasma distribution of cathodic arc deposition system; high ion charge states in vacuum arc ion sources; and gas and metal ion sources. Selected papers are indexed separately for inclusion in the Energy Science and Technology Database

Fabrication and characterization of vacuum deposited fluorescein thin films

Energy Technology Data Exchange (ETDEWEB)

Jalkanen, Pasi, E-mail: pasi.jalkanen@gmail.co [University of Jyvaeskylae, Department of Physics, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Kulju, Sampo, E-mail: sampo.j.kulju@jyu.f [University of Jyvaeskylae, Department of Physics, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Arutyunov, Konstantin, E-mail: konstantin.arutyunov@jyu.f [University of Jyvaeskylae, Department of Physics, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Antila, Liisa, E-mail: liisa.j.antila@jyu.f [University of Jyvaeskylae, Department of Chemistry, Nanoscience center (NSC) P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Myllyperkioe, Pasi, E-mail: pasi.myllyperkio@jyu.f [University of Jyvaeskylae, Department of Chemistry, Nanoscience center (NSC) P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Ihalainen, Teemu, E-mail: teemu.o.ihalainen@jyu.f [University of Jyvaeskylae, Department of Biology, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Kaeaeriaeinen, Tommi, E-mail: tommi.kaariainen@lut.f [Lappeenranta University of Technology, ASTRal, P.O. Box 181, FI-50101 Mikkeli (Finland); Kaeaeriaeinen, Marja-Leena, E-mail: marja-leena.kaariainen@lut.f [Lappeenranta University of Technology, ASTRal, P.O. Box 181, FI-50101 Mikkeli (Finland); Korppi-Tommola, Jouko, E-mail: jouko.korppi-tommola@jyu.f [University of Jyvaeskylae, Department of Biology, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland)

2011-03-31

Simple vacuum evaporation technique for deposition of dyes on various solid surfaces has been developed. The method is compatible with conventional solvent-free nanofabrication processing enabling fabrication of nanoscale optoelectronic devices. Thin films of fluorescein were deposited on glass, fluorine-tin-oxide (FTO) coated glass with and without atomically layer deposited (ALD) nanocrystalline 20 nm thick anatase TiO{sub 2} coating. Surface topology, absorption and emission spectra of the films depend on their thickness and the material of supporting substrate. On a smooth glass surface the dye initially forms islands before merging into a uniform layer after 5 to 10 monolayers. On FTO covered glass the absorption spectra are similar to fluorescein solution in ethanol. Absorption spectra on ALD-TiO{sub 2} is red shifted compared to the film deposited on bare FTO. The corresponding emission spectra at {lambda} = 458 nm excitation show various thickness and substrate dependent features, while the emission of films deposited on TiO{sub 2} is quenched due to the effective electron transfer to the semiconductor conduction band.

Assessment of heavy metals exposure, noise and thermal safety in the ambiance of a vacuum metallurgy separation system for recycling heavy metals from crushed e-wastes.

Science.gov (United States)

Zhan, Lu; Xu, Zhenming

2014-12-01

Vacuum metallurgy separation (VMS) is a technically feasible method to recover Pb, Cd and other heavy metals from crushed e-wastes. To further determine the environmental impacts and safety of this method, heavy metals exposure, noise and thermal safety in the ambiance of a vacuum metallurgy separation system are evaluated in this article. The mass concentrations of total suspended particulate (TSP) and PM10 are 0.1503 and 0.0973 mg m(-3) near the facilities. The concentrations of Pb, Cd and Sn in TSP samples are 0.0104, 0.1283 and 0.0961 μg m(-3), respectively. Health risk assessments show that the hazard index of Pb is 3.25 × 10(-1) and that of Cd is 1.09 × 10(-1). Carcinogenic risk of Cd through inhalation is 1.08 × 10(-5). The values of the hazard index and risk indicate that Pb and Cd will not cause non-cancerous effects or carcinogenic risk on workers. The noise sources are mainly the mechanical vacuum pump and the water cooling pump. Both of them have the noise levels below 80 dB (A). The thermal safety assessment shows that the temperatures of the vacuum metallurgy separation system surface are all below 303 K after adopting the circulated water cooling and heat insulation measures. This study provides the environmental information of the vacuum metallurgy separation system, which is of assistance to promote the industrialisation of vacuum metallurgy separation for recovering heavy metals from e-wastes. © The Author(s) 2014.

Effects of vacuum processing erbium dideuteride/ditritide films deposited on chromium underlays on copper substrates

International Nuclear Information System (INIS)

Provo, J.L.

1978-01-01

Thin films of erbium dideuteride/ditritide were experimentally produced on chromium underlays deposited on copper substrates. The chromium underlay is required to prevent erbium occluder/copper substrate alloying which inhibits hydriding. Data taken has shown that vacuum processing affects the erbium/chromium/copper interaction. With an in situ process in which underlay/occluder films are vacuum deposited onto copper substrates and hydrided with no air exposure between these steps, data indicates a minimum of 1500A of chromium is required for optimum hydriding. If films are vacuum deposited as above and air-exposed before hydriding, a minimum of 3000A of chromium was shown to be required for equivalent hydriding. Data suggests that the activation step (600 0 C for 1 hour) required for hydriding the film of the second type is responsible for the difference observed. Such underlay thickness parameters are important, with regard to heat transfer considerations in thin hydride targets used for neutron generation

Vacuum delivery at The Maternity Hospital Kuala Lumpur: a comparison of metal and silicone cups.

Science.gov (United States)

Lee, H Y; Subramaniam, N; Nordin, M M

1996-02-01

To compare the advantages and disadvantages of the New Bird metal cups and silicone cups in terms of maternal and foetal outcome. To study the adverse effects and factors associated with failed vacuum deliveries. A prospective randomised study of all vacuum deliveries from 1 December 1991 to 31 April 1992. The Hanshin electrical vacuum pump was used. A large obstetric unit-The Maternity Hospital Kuala Lumpur (MHKL). Seventy-two consecutive patients where vacuum deliveries were indicated. Forty had metal and 32 had silicone cups. Another 7 vacuum deliveries using the manual vacuum pump were excluded. Success rate of vaginal delivery, birth canal injuries, post-partum haemorrhage, duration of hospital stay, Apgar score, foetal injuries (scalp-ecchymosis, haematomas) neonatal jaundice, the rate of special care nursery (SCN) admission and neonatal mortality rate. Failure to deliver with silicone cups alone was 21.9% compared to 10% for metal cups alone. Material morbidities and serious foetal scalp injuries were almost the same in both cups. However, minor foetal scalp injuries were significantly lower with silicone cups. Maternal height and baby's weight had no independent predictive values for successful vacuum delivery. When the foetal head was palpable per abdomen, the failure rate was 54.5% compared to 8.2% when it was not. Failed vacuum deliveries were associated with increased maternal and foetal morbidities. Silicone cups and metal cups can be equally dangerous to the baby. Although our sample size was small, we recommend that vacuum delivery be avoided if the foetal head is palpable per abdomen.

Magnetic filtered plasma deposition and implantation technique

CERN Document Server

Zhang Hui Xing; Wu Xian Ying

2002-01-01

A high dense metal plasma can be produced by using cathodic vacuum arc discharge technique. The microparticles emitted from the cathode in the metal plasma can be removed when the metal plasma passes through the magnetic filter. It is a new technique for making high quality, fine and close thin films which have very widespread applications. The authors describe the applications of cathodic vacuum arc technique, and then a filtered plasma deposition and ion implantation system as well as its applications

Automatic gas-levitation system for vacuum deposition of laser-fusion targets

International Nuclear Information System (INIS)

Jordan, C.W.; Cameron, G.R.; Krenik, R.M.; Crane, J.K.

1981-01-01

An improved simple system has been developed to gas-levitate microspheres during vacuum-deposition processes. The automatic operation relies on two effects: a lateral stabilizing force provided by a centering-ring; and an automatically incremented gas metering system to offset weight increases during coating

Effects of substrate heating and vacuum annealing on optical and electrical properties of alumina-doped ZnO films deposited by DC magnetron sputtering

Science.gov (United States)

Tang, Chien-Jen; Wang, Chun-Yuan; Jaing, Cheng-Chung

2011-10-01

Alumina-doped zinc oxide (AZO) films have wide range of applications in optical and optoelectronic devices. AZO films have advantage in high transparency, high stability to hydrogen plasma and low cost to alternative ITO film. AZO film was prepared by direct-current (DC) magnetron sputtering from ceramic ZnO:Al2O3 target. The AZO films were compared in two different conditions. The first is substrate heating process, in which AZO film was deposited by different substrate temperature, room temperature, 150 °C and 250 °C. The second is vacuum annealing process, in which AZO film with deposited at room temperature have been annealed at 250 °C and 450 °C in vacuum. The optical properties, electrical properties, grain size and surface structure properties of the films were studied by UV-VIS-NIR spectrophotometer, Hall effect measurement equipment, x-ray diffraction, and scanning electron microscopy. The resistivity, carrier mobility, carrier concentration, and grain size of AZO films were 1.92×10-3 Ω-cm, 6.38 cm2/Vs, 5.08×1020 #/cm3, and 31.48 nm respectively, in vacuum annealing of 450 °C. The resistivity, carrier mobility, carrier concentration, and grain size of AZO films were 8.72×10-4 Ω-cm, 6.32 cm2/Vs, 1.13×1021 #/cm3, and 31.56 nm, respectively, when substrate temperature was at 250 °C. Substrate heating process is better than vacuum annealed process for AZO film deposited by DC Magnetron Sputtering.

Vacuum Pumping Performance Comparison of Non-Evaporable Getter Thin Films Deposited Using Argon and Krypton as Sputtering Gases

CERN Document Server

Liu, Xianghong; He, Yun; Li, Yulin

2005-01-01

Owing to the outstanding vacuum performance and the low secondary electron yield, non-evaporable getter (NEG) thin film deposited onto interior walls has gained widespread acceptance and has been incorporated into many accelerator vacuum system designs. The titanium-zirconium-vanadium (T-Zr-V) NEG thin films were deposited onto the interior wall of stainless steel pipes via DC magnetron sputtering method using either argon or krypton gas as sputtering gas. Vacuum pumping evaluation tests were carried out to compare vacuum pumping performances of the Ti-Zr-V NEG thin films deposited using argon or krypton. The results showed much higher initial pumping speed for the Kr-sputtered NEG film than the Ar-sputtered film, though both films have similar activation behavior. The compositions and textures of both thin films were measured to correlate to the pumping performances.

Purity and surface roughness of vacuum deposited aluminium films

Energy Technology Data Exchange (ETDEWEB)

Dhere, N G; Arsenio, T P [Instituto Militar de Engenharia, Rio de Janeiro (Brazil); Patnaik, B K [Pontificia Universidade Catolica do Rio de Janeiro (Brazil). Instituto de Fisica; Assuncao, F C.R.; de Souza, A M [Pontificia Universidade Catolica do Rio de Janeiro (Brazil). Departamento de Ciencia dos Materiais e Metalurgia

1975-04-01

The authors studied the purity, surface roughness and grain size of vacuum-deposited aluminium films, using an intermetallic crucible and a continuous feed of pure aluminium wire. The grain size and roughness were studied by electron difraction, X-ray diffraction and the scanning electron microscope. Purity was determined by X-ray fluorescence produced by proton bombardment in the Van de Graaff accelerator and by X-ray and optical emission spectrometry.

Enhancement of surface integrity of titanium alloy with copper by means of laser metal deposition process

CSIR Research Space (South Africa)

Erinosho, MF

2016-04-01

Full Text Available The laser metal deposition process possesses the combination of metallic powder and laser beam respectively. However, these combinations create an adhesive bonding that permanently solidifies the laser-enhanced-deposited powders. Titanium alloys (Ti...

Vacuum deposition and pulsed modification of Ge thin films on Si. Structure and photoluminescence

International Nuclear Information System (INIS)

Batalov, R.I.; Bayazitov, R.M.; Novikov, G.A.; Shustov, V.A.; Bizyaev, D.A.; Gajduk, P.I.; Ivlev, G.D.; Prokop'ev, S.L.

2013-01-01

Vacuum deposition of Ge thin films onto Si substrates by magnetron sputtering was studied. During deposition sputtering time and substrate temperature were varied. Nanosecond pulsed annealing of deposited films by powerful laser or ion beams was performed. The dependence of the structure and optical properties of Ge/Si films on parameters of pulsed treatments was investigated. Optimum parameters of deposition and pulsed treatments resulting into light emitting monocrystalline Ge/Si layers are determined. (authors)

Limitations of patterning thin films by shadow mask high vacuum chemical vapor deposition

International Nuclear Information System (INIS)

Reinke, Michael; Kuzminykh, Yury; Hoffmann, Patrik

2014-01-01

A key factor in engineering integrated devices such as electro-optic switches or waveguides is the patterning of high quality crystalline thin films into specific geometries. In this contribution high vacuum chemical vapor deposition (HV-CVD) was employed to grow titanium dioxide (TiO 2 ) patterns onto silicon. The directed nature of precursor transport – which originates from the high vacuum environment during the process – allows shading certain regions on the substrate by shadow masks and thus depositing patterned thin films. While the use of such masks is an emerging field in stencil or shadow mask lithography, their use for structuring thin films within HV-CVD has not been reported so far. The advantage of the employed technique is the precise control of lateral spacing and of the distance between shading mask and substrate surface which is achieved by manufacturing them directly on the substrate. As precursor transport takes place in the molecular flow regime, the precursor impinging rates (and therefore the film growth rates) on the surface can be simulated as function of the reactor and shading mask geometry using a comparatively simple mathematical model. In the current contribution such a mathematical model, which predicts impinging rates on plain or shadow mask structured substrates, is presented. Its validity is confirmed by TiO 2 -deposition on plain silicon substrates (450 °C) using titanium tetra isopropoxide as precursor. Limitations of the patterning process are investigated by the deposition of TiO 2 on structured substrates and subsequent shadow mask lift-off. The geometry of the deposits is according to the mathematical model. Shading effects due to the growing film enables to fabricate deposits with predetermined variations in topography and non-flat top deposits which are complicated to obtain by classical clean room processes. As a result of the enhanced residual pressure of decomposition products and titanium precursors and the

Ion beam sputter deposited TiAlN films for metal-insulator-metal (Ba,Sr)TiO3 capacitor application

International Nuclear Information System (INIS)

Lee, S.-Y.; Wang, S.-C.; Chen, J.-S.; Huang, J.-L.

2008-01-01

The present study evaluated the feasibility of TiAlN films deposited using the ion beam sputter deposition (IBSD) method for metal-insulator-metal (MIM) (Ba,Sr)TiO 3 (BST) capacitors. The BST films were crystallized at temperatures above 650 deg. C. TiAlN films deposited using the IBSD method were found having smooth surface and low electrical resistivity at high temperature conditions. TiAlN films showed a good diffusion barrier property against BST components. The J-E (current density-electric field) characteristics of Al/BST/TiAlN capacitors were good, with a high break down electric field of ± 2.5 MV/cm and a leakage current density of about 1 x 10 -5 A/cm 2 at an applied field of ± 0.5 MV/cm. Thermal stress and lateral oxidation that occurred at the interface damaged the capacitor stacking structure. Macro holes that dispersed on the films resulted in higher leakage current and inconsistent J-E characteristics. Vacuum annealing with lower heating rate and furnace cooling, and a Ti-Al adhesion layer between TiAlN and the SiO 2 /Si substrate can effectively minimize the stress effect. TiAlN film deposited using IBSD can be considered as a potential electrode and diffusion barrier material for MIM BST capacitors

Reaction kinetics of metal deposition via surface limited red-ox replacement of underpotentially deposited metal monolayers

International Nuclear Information System (INIS)

Gokcen, Dincer; Bae, Sang-Eun; Brankovic, Stanko R.

2011-01-01

The study of the kinetics of metal deposition via surface limited red-ox replacement of underpotentially deposited metal monolayers is presented. The model system was Pt submonolayer deposition on Au(1 1 1) via red-ox replacement of Pb and Cu UPD monolayers on Au(1 1 1). The kinetics of a single replacement reaction was studied using the formalism of the comprehensive analytical model developed to fit the open circuit potential transients from deposition experiments. The practical reaction kinetics parameters like reaction half life, reaction order and reaction rate constant are determined and discussed with their relevance to design and control of deposition experiments. The effects of transport limitation and the role of the anions/electrolyte on deposition kinetics are investigated and their significance to design of effective deposition process is discussed.

High Charge State Ions Extracted from Metal Plasmas in the Transition Regime from Vacuum Spark to High Current Vacuum Arc

International Nuclear Information System (INIS)

Yushkov, Georgy Yu.; Anders, A.

2008-01-01

Metal ions were extracted from pulsed discharge plasmas operating in the transition region between vacuum spark (transient high voltage of kV) and vacuum arc (arc voltage ∼ 20 V). At a peak current of about 4 kA, and with a pulse duration of 8 (micro)s, we observed mean ion charges states of about 6 for several cathode materials. In the case of platinum, the highest average charge state was 6.74 with ions of charge states as high as 10 present. For gold we found traces of charge state 11, with the highest average charge state of 7.25. At currents higher than 5 kA, non-metallic contaminations started to dominate the ion beam, preventing further enhancement of the metal charge states

High charge state metal ion production in vacuum arc ion sources

International Nuclear Information System (INIS)

Brown, I.G.; Anders, A.; Anders, S.

1994-01-01

The vacuum arc is a rich source of highly ionized metal plasma that can be used to make a high current metal ion source. Vacuum arc ion sources have been developed for a range of applications including ion implantation for materials surface modification, particle accelerator injection for fundamental nuclear physics research, and other fundamental and applied purposes. Typically the source is repetitively pulsed with pulse length of order a millisecond and duty cycle or order 1% and operation of a dc embodiment has been demonstrated also. Beams have been produced from over 50 of the solid metals of the periodic table, with mean ion energy up to several hundred keV and with peak (pulsed) beam current up to several amperes. The ion charge state distribution has been extensively studied. Ion spectra have been measured for a wide range of metallic cathode materials, including Li, C, Mg, Al, Si, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Pd, Ag, Cd, In, Sn, Sb, Ba, La, Ce, Pr, Nd, Sm, Gd, Dy, Ho, Er, Tm, Yb, Hf, Ta, W, Ir, Pt, Au, Pb, Bi, Th and U, as well as compound and alloy cathode materials such as TiC, SiC, UC, PbS, brass, and stainless steel. The ions generated are in general multiply-stripped with a mean charge state of from 1 to 3, depending on the particular metal species, and the charge state distribution can have components from Q = 1+ to 6+. Here the authors review the characteristics of vacuum arc ion sources from the perspective of their high charge state metal ion production

Ammonia release method for depositing metal oxides

Energy Technology Data Exchange (ETDEWEB)

Silver, G.L.; Martin, F.S.

1993-12-31

A method of depositing metal oxides on substrates which is indifferent to the electrochemical properties of the substrates and which comprises forming ammine complexes containing metal ions and thereafter effecting removal of ammonia from the ammine complexes so as to permit slow precipitation and deposition of metal oxide on the substrates.

Amorphous boron coatings produced with vacuum arc deposition technology

CERN Document Server

Klepper, C C; Yadlowsky, E J; Carlson, E P; Keitz, M D; Williams, J M; Zuhr, R A; Poker, D B

2002-01-01

In principle, boron (B) as a material has many excellent surface properties, including corrosion resistance, very high hardness, refractory properties, and a strong tendency to bond with most substrates. The potential technological benefits of the material have not been realized, because it is difficult to deposit it as coatings. B is difficult to evaporate, does not sputter well, and cannot be thermally sprayed. In this article, first successful deposition results from a robust system, based on the vacuum (cathodic) arc technology, are reported. Adherent coatings have been produced on 1100 Al, CP-Ti, Ti-6Al-4V, 316 SS, hard chrome plate, and 52 100 steel. Composition and thickness analyses have been performed by Rutherford backscattering spectroscopy. Hardness (H) and modules (E) have been evaluated by nanoindentation. The coatings are very pure and have properties characteristic of B suboxides. A microhardness of up to 27 GPa has been measured on a 400-nm-thick film deposited on 52 100 steel, with a corresp...

Ion beam sputter deposited TiAlN films for metal-insulator-metal (Ba,Sr)TiO{sub 3} capacitor application

Energy Technology Data Exchange (ETDEWEB)

Lee, S.-Y. [Department of Materials Science and Engineering, National Cheng Kung University, No. 1, Ta-Hsueh Road, Tainan, Taiwan (China); Wang, S.-C. [Department of Mechanical Engineering, Southern Taiwan University of Technology, No. 1, Nantai St, Yung-Kang City, Tainan, Taiwan (China); Chen, J.-S. [Department of Materials Science and Engineering, National Cheng Kung University, No. 1, Ta-Hsueh Road, Tainan, Taiwan (China); Huang, J.-L. [Department of Materials Science and Engineering, National Cheng Kung University, No. 1, Ta-Hsueh Road, Tainan, Taiwan (China)], E-mail: jlh888@mail.ncku.edu.tw

2008-09-01

The present study evaluated the feasibility of TiAlN films deposited using the ion beam sputter deposition (IBSD) method for metal-insulator-metal (MIM) (Ba,Sr)TiO{sub 3} (BST) capacitors. The BST films were crystallized at temperatures above 650 deg. C. TiAlN films deposited using the IBSD method were found having smooth surface and low electrical resistivity at high temperature conditions. TiAlN films showed a good diffusion barrier property against BST components. The J-E (current density-electric field) characteristics of Al/BST/TiAlN capacitors were good, with a high break down electric field of {+-} 2.5 MV/cm and a leakage current density of about 1 x 10{sup -5} A/cm{sup 2} at an applied field of {+-} 0.5 MV/cm. Thermal stress and lateral oxidation that occurred at the interface damaged the capacitor stacking structure. Macro holes that dispersed on the films resulted in higher leakage current and inconsistent J-E characteristics. Vacuum annealing with lower heating rate and furnace cooling, and a Ti-Al adhesion layer between TiAlN and the SiO{sub 2}/Si substrate can effectively minimize the stress effect. TiAlN film deposited using IBSD can be considered as a potential electrode and diffusion barrier material for MIM BST capacitors.

Microstructure of vapor deposited coatings on curved substrates

Energy Technology Data Exchange (ETDEWEB)

Rodgers, Theron M.; Zhao, Hengbei; Wadley, Haydn N. G., E-mail: haydn@virginia.edu [Department of Materials Science and Engineering, University of Virginia, 395 McCormick Rd., P.O. Box 400745, Charlottesville, Virginia 22904 (United States)

2015-09-15

Thermal barrier coating systems consisting of a metallic bond coat and ceramic over layer are widely used to extend the life of gas turbine engine components. They are applied using either high-vacuum physical vapor deposition techniques in which vapor atoms rarely experience scattering collisions during propagation to a substrate, or by gas jet assisted (low-vacuum) vapor deposition techniques that utilize scattering from streamlines to enable non-line-of-sight deposition. Both approaches require substrate motion to coat a substrate of complex shape. Here, direct simulation Monte Carlo and kinetic Monte Carlo simulation methods are combined to simulate the deposition of a nickel coating over the concave and convex surfaces of a model airfoil, and the simulation results are compared with those from experimental depositions. The simulation method successfully predicted variations in coating thickness, columnar growth angle, and porosity during both stationary and substrate rotated deposition. It was then used to investigate a wide range of vapor deposition conditions spanning high-vacuum physical vapor deposition to low-vacuum gas jet assisted vapor deposition. The average coating thickness was found to increase initially with gas pressure reaching a maximum at a chamber pressure of 8–10 Pa, but the best coating thickness uniformity was achieved under high vacuum deposition conditions. However, high vacuum conditions increased the variation in the coatings pore volume fraction over the surface of the airfoil. The simulation approach was combined with an optimization algorithm and used to investigate novel deposition concepts to tailor the local coating thickness.

Microstructure of vapor deposited coatings on curved substrates

International Nuclear Information System (INIS)

Rodgers, Theron M.; Zhao, Hengbei; Wadley, Haydn N. G.

2015-01-01

Thermal barrier coating systems consisting of a metallic bond coat and ceramic over layer are widely used to extend the life of gas turbine engine components. They are applied using either high-vacuum physical vapor deposition techniques in which vapor atoms rarely experience scattering collisions during propagation to a substrate, or by gas jet assisted (low-vacuum) vapor deposition techniques that utilize scattering from streamlines to enable non-line-of-sight deposition. Both approaches require substrate motion to coat a substrate of complex shape. Here, direct simulation Monte Carlo and kinetic Monte Carlo simulation methods are combined to simulate the deposition of a nickel coating over the concave and convex surfaces of a model airfoil, and the simulation results are compared with those from experimental depositions. The simulation method successfully predicted variations in coating thickness, columnar growth angle, and porosity during both stationary and substrate rotated deposition. It was then used to investigate a wide range of vapor deposition conditions spanning high-vacuum physical vapor deposition to low-vacuum gas jet assisted vapor deposition. The average coating thickness was found to increase initially with gas pressure reaching a maximum at a chamber pressure of 8–10 Pa, but the best coating thickness uniformity was achieved under high vacuum deposition conditions. However, high vacuum conditions increased the variation in the coatings pore volume fraction over the surface of the airfoil. The simulation approach was combined with an optimization algorithm and used to investigate novel deposition concepts to tailor the local coating thickness

Separating and recycling metals from mixed metallic particles of crushed electronic wastes by vacuum metallurgy.

Science.gov (United States)

Zhan, Lu; Xu, Zhenming

2009-09-15

During the treatment of electronic wastes, a crushing process is usually used to strip metals from various base plates. Several methods have been applied to separate metals from nonmetals. However, mixed metallic particles obtained from these processes are still a mixture of various metals, including some toxic heavy metals such as lead and cadmium. With emphasis on recovering copper and other precious metals, there have hitherto been no satisfactory methods to recover these toxic metals. In this paper, the criterion of separating metals from mixed metallic particles by vacuum metallurgy is built. The results show that the metals with high vapor pressure have been almost recovered completely, leading to a considerable reduction of environmental pollution. In addition, the purity of copper in mixed particles has been improved from about 80 wt % to over 98 wt %.

Application of vacuum metallurgy to separate pure metal from mixed metallic particles of crushed waste printed circuit board scraps.

Science.gov (United States)

Zhan, Lu; Xu, Zhenming

2008-10-15

The principle of separating pure metal from mixed metallic particles (MMPs) byvacuum metallurgy is that the vapor pressures of various metals at the same temperature are different As a result, the metal with high vapor pressure and low boiling point can be separated from the mixed metals through distillation or sublimation, and then it can be recycled through condensation under a certain condition. The vacuum metallurgy separation (VMS) of MMPs of crushed waste printed circuit boards (WPCBs) has been studied in this paper. Theoretical analyses show that the MMPs (copper, zinc, bismuth, lead, and indium, for example) can be separated by vacuum metallurgy. The copper particles (0.15-0.20 mm) and zinc particles (<0.30 mm) were chosen to simulate the MMPs of crushed WPCBs. Experimental results show that the separated efficiency of zinc in the copper-rich particles achieves 96.19 wt % when the vacuum pressure is 0.01-0.10 Pa, the heating temperature is 1123 K, and the heating time is 105 min. Under this operation condition, the separated efficiency of zinc in the copper-rich particles from crushed WPCBs achieves 97.00 wt % and the copper purity increases from 90.68 to 99.84 wt %.

Thermal deposition of intact tetrairon(III) single-molecule magnets in high-vacuum conditions.

Science.gov (United States)

Margheriti, Ludovica; Mannini, Matteo; Sorace, Lorenzo; Gorini, Lapo; Gatteschi, Dante; Caneschi, Andrea; Chiappe, Daniele; Moroni, Riccardo; de Mongeot, Francesco Buatier; Cornia, Andrea; Piras, Federica M; Magnani, Agnese; Sessoli, Roberta

2009-06-01

A tetrairon(III) single-molecule magnet is deposited using a thermal evaporation technique in high vacuum. The chemical integrity is demonstrated by time-of-flight secondary ion mass spectrometry on a film deposited on Al foil, while superconducting quantum interference device magnetometry and alternating current susceptometry of a film deposited on a kapton substrate show magnetic properties identical to the pristine powder. High-frequency electron paramagnetic resonance spectra confirm the characteristic behavior for a system with S = 5 and a large Ising-type magnetic anisotropy. All these results indicate that the molecules are not damaged during the deposition procedure keeping intact the single-molecule magnet behavior.

Vacuum welding of metals; Soudage des metaux sous vide

Energy Technology Data Exchange (ETDEWEB)

Stohr, J A; Briola, J [Commissariat a l' Energie Atomique, Saclay (France). Centre d' Etudes Nucleaires

1958-07-01

This new welding process has been developed by the Commissariat a l'Energie Atomique (CEA) in France. The edges of the work-pieces are melted by the impact of an electron beam produced by an electron gun. Welding is carried out in a vacuum of 10{sup -4} to 10{sup -8} mm of mercury. The welding machine consists, diagrammatically, of: a) a metal enclosure in which a vacuum is produced; b) a cathode for electron emission, a high-voltage generator for accelerating these electrons, a focusing device; c) a mechanical device for moving (rotating) the work-piece. Advantages of the process: 1) possible welding of highly oxidizable metals (e.g. zirconium); 2) fabrication of high-vacuum-sealed metal containers; 3) production of very deeply penetrated welds. Therefore, this new process is particularly advantageous for atomic power applications, the fabrication of electron tubes and, more generally, for all industries in which very special metals are used. (author) [French] Ce procede de soudage a ete recemment mis au point au Commissariat a l'Energie Atomique en France (CEA). Il consiste a utiliser, pour fondre les levres des pieces a souder, l'impact d'un faisceau d'electrons produit par un canon a electrons. Le soudage s'effectue sous un vide de 10{sup -4} a 10{sup -8} mm de mercure. La machine a souder se compose schematiquement: a) d'une enceinte metallique ou l'on fait le vide; b) d'une cathode emettant des electrons, d'un generateur H.T. permettant d'accelerer ces electrons d'un dispositif de focalisation; c) d'un dispositif mecanique permettant le deplacement (rotation) de la piece a souder. Avantages de ce procede: 1) possibilite de souder les metaux tres oxydables (exemple: zirconium); 2) realisation de 'containers' metalliques fermes sous vide pousse; 3) obtention de profondeurs de soudures considerables. Ce nouveau procede est donc particulierement interessant pour l ' energie atomique, la fabrication des tubes electroniques et, en general, toutes les industries

Wafer-Level Vacuum Packaging of Smart Sensors.

Science.gov (United States)

Hilton, Allan; Temple, Dorota S

2016-10-31

The reach and impact of the Internet of Things will depend on the availability of low-cost, smart sensors-"low cost" for ubiquitous presence, and "smart" for connectivity and autonomy. By using wafer-level processes not only for the smart sensor fabrication and integration, but also for packaging, we can further greatly reduce the cost of sensor components and systems as well as further decrease their size and weight. This paper reviews the state-of-the-art in the wafer-level vacuum packaging technology of smart sensors. We describe the processes needed to create the wafer-scale vacuum microchambers, focusing on approaches that involve metal seals and that are compatible with the thermal budget of complementary metal-oxide semiconductor (CMOS) integrated circuits. We review choices of seal materials and structures that are available to a device designer, and present techniques used for the fabrication of metal seals on device and window wafers. We also analyze the deposition and activation of thin film getters needed to maintain vacuum in the ultra-small chambers, and the wafer-to-wafer bonding processes that form the hermetic seal. We discuss inherent trade-offs and challenges of each seal material set and the corresponding bonding processes. Finally, we identify areas for further research that could help broaden implementations of the wafer-level vacuum packaging technology.

Wafer-Level Vacuum Packaging of Smart Sensors

Directory of Open Access Journals (Sweden)

Allan Hilton

2016-10-01

Full Text Available The reach and impact of the Internet of Things will depend on the availability of low-cost, smart sensors—“low cost” for ubiquitous presence, and “smart” for connectivity and autonomy. By using wafer-level processes not only for the smart sensor fabrication and integration, but also for packaging, we can further greatly reduce the cost of sensor components and systems as well as further decrease their size and weight. This paper reviews the state-of-the-art in the wafer-level vacuum packaging technology of smart sensors. We describe the processes needed to create the wafer-scale vacuum microchambers, focusing on approaches that involve metal seals and that are compatible with the thermal budget of complementary metal-oxide semiconductor (CMOS integrated circuits. We review choices of seal materials and structures that are available to a device designer, and present techniques used for the fabrication of metal seals on device and window wafers. We also analyze the deposition and activation of thin film getters needed to maintain vacuum in the ultra-small chambers, and the wafer-to-wafer bonding processes that form the hermetic seal. We discuss inherent trade-offs and challenges of each seal material set and the corresponding bonding processes. Finally, we identify areas for further research that could help broaden implementations of the wafer-level vacuum packaging technology.

Optical properties of vacuum deposited polyaniline ultra-thin film

International Nuclear Information System (INIS)

Wahab, M. R. A.; Din, M.; Yunus, W. M. M.; Hasan, Z. A.; Kasim, A.

2005-01-01

Full text: Ultra-thin films of emeraldine base (EB) and emeraldine salt (ES) form of polyaniline (PANi) were prepared using electron-gun vacuum deposition. Thickness range studied was between 100AA and 450AA. Dielectric permittivity of the films determined from Kretchmann Configuration Surface Plasmon Resonance (SPR) angles-scanning set-up show shifts and narrowing of the SPR dip. Absorbance spectra of S-polarized and P-polarized light show the aging effect on orientation of the film. The effect of aging on its conductivity and photoluminescence is also correlated to the surface morphology

Multilayer Ti-Cr-N Coatings Produced by the Vacuum-Arc Deposition

International Nuclear Information System (INIS)

Kunchenko, Yu.V.; Kunchenko, V.V.; Neklyudov, I.M.; Kartmazov, G.N.; Andreev, A.A.

2007-01-01

A possibility is demonstrated for nanolayer TiN x /CrN x coating formation by the method of vacuum-arc deposition on the substrate, which being rotated around the 'Bulat'-type chamber axis intercepts sequentially the plasma flows generated by three evaporators. The model for calculating the coating deposition rate (thickness) was used to determine the geometrical parameters that provide the formation of layer structures in the nanometer range. The variations of phase-structure characteristics, compression microstresses (σ) microhardness (H v ) of the coating formed have been investigated as functions of nitrogen pressure (P N =0.001...1.0 Pa), bias voltage (U=-100...-300 V) and condensation temperature (T C =330...750 degree C) at focusing magnetic field strength H F =0; 35 and 100 Oe. The mentioned field strengths were responsible for the ion current densities (j∼5,8...10 and ≥15 mA/cm 2 ). A nonmonotonic behaviour of H v as a function of condensation temperature and of vacuum annealing temperature has been established. The maximum H v values (∼35...37 GPa) were observed in the 450...500 degree C range

A Study of Deposition Coatings Formed by Electroformed Metallic Materials.

Directory of Open Access Journals (Sweden)

Shoji Hayashi

Full Text Available Major joining methods of dental casting metal include brazing and laser welding. However, brazing cannot be applied for electroformed metals since heat treatment could affect the fit, and, therefore, laser welding is used for such metals. New methods of joining metals that do not impair the characteristics of electroformed metals should be developed. When new coating is performed on the surface of the base metal, surface treatment is usually performed before re-coating. The effect of surface treatment is clinically evaluated by peeling and flex tests. However, these testing methods are not ideal for deposition coating strength measurement of electroformed metals. There have been no studies on the deposition coating strength and methods to test electroformed metals. We developed a new deposition coating strength test for electroformed metals. The influence of the negative electrolytic method, which is one of the electrochemical surface treatments, on the strength of the deposition coating of electroformed metals was investigated, and the following conclusions were drawn: 1. This process makes it possible to remove residual deposits on the electrodeposited metal surface layer. 2. Cathode electrolysis is a simple and safe method that is capable of improving the surface treatment by adjustments to the current supply method and current intensity. 3. Electrochemical treatment can improve the deposition coating strength compared to the physical or chemical treatment methods. 4. Electro-deposition coating is an innovative technique for the deposition coating of electroformed metal.

Metal Deposition from Organic Solutions for Microelectronic Applications

National Research Council Canada - National Science Library

Dahlgren, E

2001-01-01

... plating in aqueous solutions. This process was also shown to be capable of producing selectively deposited seed layers only on exposed reactive metal surfaces for subsequent electroless and electrolytic metal depositions...

Deposition of metal Islands, metal clusters and metal containing single molecules on self-assembled monolayers

NARCIS (Netherlands)

Speets, Emiel Adrianus

2005-01-01

The central topic of this thesis is the deposition of metals on Self-Assembled Monolayers (SAMs). Metals are deposited in the form of submicron scale islands, nanometer scale clusters, and as supramolecular, organometallic coordination cages. Several SAMs on various substrates were prepared and

Titanium nitride deposition in titanium implant alloys produced by powder metallurgy

International Nuclear Information System (INIS)

Henriques, V.A.R.; Cairo, C.A.A.; Faria, J.; Lemos, T.G.; Galvani, E.T.

2009-01-01

Titanium nitride (TiN) is an extremely hard material, often used as a coating on titanium alloy, steel, carbide, and aluminum components to improve wear resistance. Electron Beam Physical Vapor Deposition (EB-PVD) is a form of deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum, producing a thin film in a substrate. In this work are presented results of TiN deposition in targets and substrates of Ti (C.P.) and Ti- 13 Nb- 13 Zr obtained by powder metallurgy. Samples were produced by mixing of hydride metallic powders followed by uniaxial and cold isostatic pressing with subsequent densification by sintering between 900°C up to 1400 °C, in vacuum. The deposition was carried out under nitrogen atmosphere. Sintered samples were characterized for phase composition, microstructure and microhardness by X-ray diffraction, scanning electron microscopy and Vickers indentation, respectively. It was shown that the samples were sintered to high densities and presented homogeneous microstructure, with ideal characteristics for an adequate deposition and adherence. The film layer presented a continuous structure with 15μm. (author)

Metasomatic zoning at some stratiform rare metal deposits

International Nuclear Information System (INIS)

Altyntsev, Yu.V.; Bazhenov, M.I.; Bepeshov, G.V.; Komarnitskij, G.M.; Petrov, I.Ya.; Serykh, A.S.

1985-01-01

Metasomatic zoning of stratiform deposits of rare metals (Mo, Pb, As, V, Se, U, etc.) in intermontane depresions, deposited at the postorogenic stage of Paleozoic geosyncline region development, is considered. Geochemical and geophysical characteristics of metasomatic zoning in the case of sloping and steep rock deposition are given. It is established, that in rare metal deposits in variegated deposits of molassoid formation of Middle-Upper Paleozoic the external and internal zones of metasomatic alterations are distinctly separated. The external zone is presented by mineral association: quartz + -albile + -calcite + -epidote; the internal one - by hydromica + -chlorite + -analcite, laumontite + -hematite + -ankerite + -kaolinite. Geochemical zoning is manifested quite regularly at all the deposits and it is subjected to metasomatic zoning. Changes in physical properties of rocks reflect the metasomatic zoning. The character of metasomatic alterations of rocks, geochemical zoning of metasomatites at rare metal deposits in molassoid deposits and spatially contiguous deposits in volcanogenic complexes have common features. A supposition is made on polygenic ore formation in sedimentary rocks of the depressions

[Pollution evaluation and health risk assessment of heavy metals from atmospheric deposition in Lanzhou].

Science.gov (United States)

Li, Ping; Xue, Su-Yin; Wang, Sheng-Li; Nan, Zhong-Ren

2014-03-01

In order to evaluate the contamination and health risk of heavy metals from atmospheric deposition in Lanzhou, samples of atmospheric deposition were collected from 11 sampling sites respectively and their concentrations of heavy metals were determined. The results showed that the average contents of Cu, Pb, Cd, Cr, Ni, Zn and Mn were 82.22, 130.31, 4.34, 88.73, 40.64, 369.23 and 501.49 mg x kg(-1), respectively. There was great difference among different functional areas for all elements except Mn. According to the results, the enrichment factor score of Mn was close to 1, while the enrichment of Zn, Ni, Cu and Cr was more serious, and Pb and Cd were extremely enriched. The assessment results of geoaccumulation index of potential ecological risk indicated that the pollution of Cd in the atmospheric deposition of Lanzhou should be classified as extreme degree, and that of Cu, Ni, Zn, Pb as between slight and extreme degrees, and Cr as practically uncontaminated. Contaminations of atmospheric dust by heavy metals in October to the next March were more serious than those from April to August. Health risk assessment indicated that the heavy metals in atmospheric deposition were mainly ingested by human bodies through hand-mouth ingestion. The non-cancer risk was higher for children than for adults. The order of non-cancer hazard indexes of heavy metals was Pb > Cr > Cd > Cu > Ni > Zn. The non-cancer hazard indexes and carcinogen risks of heavy metals were both lower than their threshold values, suggesting that they will not harm the health.

Salt evaporation behaviors of uranium deposits from an electrorefiner

International Nuclear Information System (INIS)

Sung Bin Park; Dong Wook Cho; Gyu Hwan Oh; Sung Chan Hwang; Young Ho Kang; Hansoo Lee; Eung Ho Kim; Seong-Won Park; Jong Hyeon Lee

2010-01-01

From an electrorefining process, uranium deposits were recovered at the solid cathode of an electrorefining system. The uranium deposits from the electrorefiner contained about 30-40 wt% salts. In order to recover pure uranium and transform it into metal ingots, these salts have to be removed. A salt distiller was adapted for a salt evaporation. A batch operation for the salt removal was carried out by a heating and a vacuum evaporation. The operational conditions were a 700-1,000 deg C hold temperature and less than a 1 Torr under Argon atmosphere, respectively. The behaviors of the salt evaporations were investigated by focusing on the effects of the pressure and the holding temperature for the salt distillation. The removal efficiencies of the salts were obtained with regard to the operational conditions. The experimental results of the salt evaporations were evaluated by using the Hertz-Langmuir relation. The effective evaporation coefficients of this relation were obtained with regards to the vacuum pressures and the hold temperatures. The higher the vacuum pressure and the higher the holding temperature were, the higher the removal efficiencies of the salts were. (author)

Vacuum brazing of metals (1961); Brassure sous vide des metaux (1961)

Energy Technology Data Exchange (ETDEWEB)

Lapujoulade, J [Commissariat a l' Energie Atomique, Saclay (France). Centre d' Etudes Nucleaires

1961-07-01

We have studied brazing in vacuum aiming its application for the making of containers and apparatus meant for high vacuum (p < 10{sup -8} torr). We first define the wettability of a brazing alloy on a metal and we remind the influence of the various parameters which act on this wettability (nature of the solid, of the liquid, geometrical and physicochemical state of the surface, metallurgical reactions occurring at the interface, temperature, time). We give then the results of the tests carried out in order to determine the conditions of wettability in vacuum of some brazing alloys on metals which can be used for the above mentioned apparatus (stainless steel, aluminium, bronze, titanium, zirconium, kovar, nickel, copper). (author) [French] Nous avons etudie la brasure sous vide en vue de son application a la construction d'enceintes et apparelilage destines a l'obtention des vides eleves (p < 10{sup -8} torr). Nous definissons d'abord la mouillabilite d'une brasure sur un metal et nous rappelons l'influence des differents parametres qui agissent sur cette mouillabilite (nature du solide, du liquide, etat geometrique et physico-chimique de la surface, reactions metallurgiques a l'interface, temperature, temps). Nous donnons ensuite les resultats des essais effectues dans le but de determiner les conditions de mouillabilite sous vide de certaines brassures sur des metaux utilisables dans les constructions mentionnees ci-dessus (acier inoxydable, bronze d'aluminium, titane, zirconium, kovar, nickel, cuivre). (auteur)

Gasification of carbon deposits on catalysts and metal surfaces

Energy Technology Data Exchange (ETDEWEB)

Figueiredo, J L

1986-10-01

'Coke' deposited on catalysts and reactor surfaces includes a variety of carbons of different structures and origins, their reactivities being conveniently assessed by Temperature Programmed Reaction (TPR). The gasification of carbon deposits obtained in the laboratory under well controlled conditions, and the regeneration of coked catalysts from petroleum refining processes are reviewed and discussed. Filamentary carbon deposits, containing dispersed metal particles, behave as supported metal catalysts during gasification, and show high reactivities. Pyrolytic and acid catalysis carbons are less reactive on their own, as the gasification is not catalysed; however, metal components of the catalyst or metal impurities deposited on the surface may enhance gasification. 26 refs., 8 figs., 2 tabs.

Vacuum tight sodium resistant compound between ThO2 ceramic and metal

International Nuclear Information System (INIS)

Reetz, T.

A method for evaluating the mechanical tensions for metal/ ceramic joinings was applied to the selection of metal components for a highly vacuum tight, sodium-resistant metal/ThO 2 ceramic solder joining. The metal component selected was the iron--nickel alloy Dilasil which is joined to the ceramic using a nickel-based solder. The wetting of the cearamic could be carried out using the titanium hydride technique or after the formation of a W-cerium layer on the surface of this ceramic. (U.S.)

A high current metal vapour vacuum arc ion source for ion implantation studies

International Nuclear Information System (INIS)

Evans, P.J.; Noorman, J.T.; Watt, G.C.; Cohen, D.D.; Bailey, G.M.

1989-01-01

The main features of the metal vapour vacuum arc(MEVA) as an ion source are presented. The technology utilizes the plasma production capabilities of a vacuum arc cathode. Some of the ions produced in this discharge flow through the anode and the 3 extraction grids to form an extracted ion beam. The high beam current and the potential for generating broad beams, make this technology suitable for implantation of large surface areas. The composition of the vacuum arc cathode determines the particular ions obtained from the MEVA source. 3 refs., 1 tab., 2 figs

Deposition of titanium carbide films from mixed carbon and titanium plasma streams

International Nuclear Information System (INIS)

Delplancke-Ogletree, M.; Monteiro, O.R.

1997-01-01

Dual source metal plasma immersion ion implantation and deposition was used to deposit Ti x C y films over a wide range of Ti:C composition. This technique is well adapted for this purpose and allows one to tailor the microstructure and properties of the films. We investigated the variation of the composition, bonding states, and structure as functions of the deposition conditions. Excess carbon and contamination oxygen are incorporated in the TiC lattice interstitially and substitutionally, respectively. The wear mechanism of a stoichiometric TiC film was investigated and compared to that of a diamondlike carbon film. TiC fails by wear and microcrack propagation. copyright 1997 American Vacuum Society

The multilayered structure of ultrathin amorphous carbon films synthesized by filtered cathodic vacuum arc deposition

KAUST Repository

Wang, Na; Komvopoulos, Kyriakos

2013-01-01

The structure of ultrathin amorphous carbon (a-C) films synthesized by filtered cathodic vacuum arc (FCVA) deposition was investigated by high-resolution transmission electron microscopy, electron energy loss spectroscopy, and x-ray photoelectron

Implementation of complex nanosystems using a versatile ultrahigh vacuum nonlithographic technique

International Nuclear Information System (INIS)

Das, Biswajit; Banerjee, Arghya

2007-01-01

We have developed an ultrahigh vacuum technique for the implementation of complex nanosystems incorporating nonlithographic nanoparticles, ohmic contact metals and isolation dielectrics. The technique is compatible with the silicon integrated circuit manufacturing process and is versatile, allowing the deposition of nanoparticles of any metal, semiconductor or insulator with diameters as small as 2 nm with less than 5% size variation. In addition, the technique allows the creation of multi-layered structures of nanoparticles of different dimensions. The flexibility and the versatility of the technique have been demonstrated by depositing nanoparticles of various materials as well as fabricating multi-layered structures incorporating nanoparticles

Enhancement of isotope exchange reactions over ceramic breeder material by deposition of catalyst metal

International Nuclear Information System (INIS)

Narisato, Y.; Munakata, K.; Koga, A.; Yokoyama, Y.; Takata, T.; Okabe, H.

2004-01-01

The deposition of catalyst metals in ceramic breeders could enhance the release rate of tritium due to the promotion of isotope exchange reactions taking place at the interface of the breeder surface and the sweep gas. In this work, the authors examined the effects of catalytic active metal deposited on lithium titanate on the isotope exchange reactions. With respect to the virgin lithium titanate, it was found that the rate of the isotope exchange reactions taking place on the surface is quite low. However, the deposition of palladium greatly increased the exchange reaction rate. The effect of the amounts of deposited palladium on the isotope exchange reaction rate was also investigated. The results indicate that the exchange reactions are still enhanced even if the amounts of deposited palladium are as low as 0.04%

A Carbon Nanotube Electron Source Based Ionization Vacuum Gauge

Energy Technology Data Exchange (ETDEWEB)

Changkun Dong; Ganapati Myneni

2003-10-01

The results of fabrication and performance of an ionization vacuum gauge using a carbon nanotube (CNT) electron source are presented. The electron source was constructed with multi-wall nanotubes (MWNT), which were grown using thermal chemical vapor deposition (CVD) process. The electron emission of the source was stable in vacuum pressure up to 10-7 Torr, which is better than the metal field emitters. The measurement linearity of the gauge was better than {+-}10% from 10-6 to 10-10 Torr. The gauge sensitivity of 4 Torr-1 was achieved under 50 {micro}A electron emission in nitrogen. The gauge is expected to find applications in vacuum measurements from 10-7 Torr to below 10-11 Torr.

Vacuum spark breakdown model based on exploding metal wire phenomena

International Nuclear Information System (INIS)

Haaland, J.

1984-06-01

Spark source mass spectra (SSMS) indicates that ions are extracted from an expanding and decaying plasma. The intensity distribution shows no dependance on vaporization properties of individual elements which indicates explosive vapour formation. This seems further to be a requirement for bridging a vacuum gap. A model including plasma ejection from a superheated anode spot by a process similar to that of an exploding metal wire is proposed. The appearance of hot plasma points in low inductance vacuum sparks can then be explained as exploding micro particles ejected from a final central anode spot. The phenomenological model is compared with available experimental results from literature, but no extensive quantification is attempted

Atomic layer deposition of HfO{sub 2} for integration into three-dimensional metal-insulator-metal devices

Energy Technology Data Exchange (ETDEWEB)

Assaud, Loic [Aix Marseille Univ, CNRS, CINAM, Marseille (France); ICMMO-ERIEE, Universite Paris-Sud / Universite Paris-Saclay, CNRS, Orsay (France); Pitzschel, Kristina; Barr, Maissa K.S.; Petit, Matthieu; Hanbuecken, Margrit; Santinacci, Lionel [Aix Marseille Univ, CNRS, CINAM, Marseille (France); Monier, Guillaume [Universite Clermont Auvergne, Universite Blaise Pascal, CNRS, Institut Pascal, Clermont-Ferrand (France)

2017-12-15

HfO{sub 2} nanotubes have been fabricated via a template-assisted deposition process for further use in three-dimensional metal-insulator-metal (MIM) devices. HfO{sub 2} thin layers were grown by Atomic Layer Deposition (ALD) in anodic alumina membranes (AAM). The ALD was carried out using tetrakis(ethylmethylamino)hafnium and water as Hf and O sources, respectively. Long exposure durations to the precursors have been used to maximize the penetration depth of the HfO{sub 2} layer within the AAM and the effect of the process temperature was investigated. The morphology, the chemical composition, and the crystal structure were studied as a function of the deposition parameters using transmission and scanning electron microscopies, X-ray photoelectron spectroscopy, and X-ray diffraction, respectively. As expected, the HfO{sub 2} layers grown at low-temperature (T = 150 C) were amorphous, while for a higher temperature (T = 250 C), polycrystalline films were observed. The electrical characterizations have shown better insulating properties for the layers grown at low temperature. Finally, TiN/HfO{sub 2}/TiN multilayers were grown in an AAM as proof-of-concept for three-dimensional MIM nanostructures. (orig.)

Study of ion implantation in grown layers of multilayer coatings under ion-plasma vacuum deposition

International Nuclear Information System (INIS)

Voevodin, A.A.; Erokhin, A.L.

1993-01-01

The model of ion implantation into growing layers of a multilayer coating produced with vacuum ion-plasma deposition was developed. The model takes into account a possibility for ions to pass through the growing layer and alloys to find the distribution of implanted atoms over the coating thickness. The experimental vitrification of the model was carried out on deposition of Ti and TiN coatings

New developments in metal ion implantation by vacuum arc ion sources and metal plasma immersion

International Nuclear Information System (INIS)

Brown, I.G.; Anders, A.; Anders, S.

1996-01-01

Ion implantation by intense beams of metal ions can be accomplished using the dense metal plasma formed in a vacuum arc discharge embodied either in a vacuum arc ion source or in a metal plasma immersion configuration. In the former case high energy metal ion beams are formed and implantation is done in a more-or-less conventional way, and in the latter case the substrate is immersed in the plasma and repetitively pulse-biased so as to accelerate the ions at the high voltage plasma sheath formed at the substrate. A number of advances have been made in the last few years, both in plasma technology and in the surface modification procedures, that enhance the effectiveness and versatility of the methods, including for example: controlled increase of the in charge states produced; operation in a dual metal-gaseous ion species mode; very large area beam formation; macroparticle filtering; and the development of processing regimes for optimizing adhesion, morphology and structure. These complementary ion processing techniques provide the plasma tools for doing ion surface modification over a very wide parameter regime, from pure ion implantation at energies approaching the MeV level, through ion mixing at energies in the ∼1 to ∼100 keV range, to IBAD-like processing at energies from a few tens of eV to a few keV. Here the authors review the methods, describe a number of recent developments, and outline some of the surface modification applications to which the methods have been put. 54 refs., 9 figs

History of atomic layer deposition and its relationship with the American Vacuum Society

NARCIS (Netherlands)

Parsons, G.N.; Elam, J.W.; George, S.M.; Haukka, S.; Jeon, H.; Kessels, W.M.M.; Leskelä, M.; Poodt, P.; Ritala, M.; Rossnagel, S.M.

2013-01-01

This article explores the history of atomic layer deposition (ALD) and its relationship with the American Vacuum Society (AVS). The authors describe the origin and history of ALD science in the 1960s and 1970s. They also report on how the science and technology of ALD progressed through the 1990s

Copper-Silver Alloy Depositions Using Thermionic Vacuum ARC (TVA)

International Nuclear Information System (INIS)

Akan, T.

2004-01-01

TVA is a plasma source generating pure metal vapor plasma and consists of a heated cathode emitting thermo electrons and an anode containing material to be evaporated. We used Cu and Ag pieces as anode materials and produced their alloys by electron bombarding. Cu-Ag alloys in various mass ratios were prepared by using the TVA and the TVA discharges were generated in the vapors of these alloys. The volt-ampere characteristics of the TVA discharges generated in the vapors of these alloys were investigated with respect to the ratio of Ag in the Cu-Ag alloy. Cu-Ag alloy thin films with various mass ratios were deposited onto the glass substrates by using their TVA discharges. The ratios of Cu and Ag in the thin Cu-Ag alloy films were found using scanning electron microscope-energy dispersive xray (SEM-EDX) microanalyses

A comparison of multi-metal deposition processes utilising gold nanoparticles and an evaluation of their application to 'low yield' surfaces for finger mark development.

Science.gov (United States)

Fairley, C; Bleay, S M; Sears, V G; NicDaeid, N

2012-04-10

This paper reports a comparison of the effectiveness and practicality of using different multi-metal deposition processes for finger mark development. The work investigates whether modifications can be made to improve the performance of the existing process published by Schnetz. Secondly, we compare the ability of different multi-metal deposition processes to develop finger marks on a range of surfaces with that of other currently used development processes. All published multi-metal deposition processes utilise an initial stage of colloidal gold deposition followed by enhancement of the marks with using a physical developer. All possible combinations of colloidal gold and physical developer stages were tested. The method proposed by Schnetz was shown to be the most effective process, however a modification which reduced the pH of the enhancement solution was revealed to provide the best combination of effectiveness and practicality. In trials comparing the modified formulation with vacuum metal deposition, superglue and powder suspensions on surfaces which typically give low finger mark yields (cling film, plasticised vinyl, leather and masking tape), the modified method produced significantly better results over existing processes for cling film and plasticised vinyl. The modified formulation was found to be ineffective on both masking tape and leather. It is recommended that further tests be carried out on the modified multi-metal deposition formulation to establish whether it could be introduced for operational work on cling film material in particular. Copyright © 2011 Elsevier Ireland Ltd. All rights reserved.

Synthesis of aluminum nitride films by plasma immersion ion implantation-deposition using hybrid gas-metal cathodic arc gun

International Nuclear Information System (INIS)

Shen Liru; Fu, Ricky K.Y.; Chu, Paul K.

2004-01-01

Aluminum nitride (AlN) is of interest in the industry because of its excellent electronic, optical, acoustic, thermal, and mechanical properties. In this work, aluminum nitride films are deposited on silicon wafers (100) by metal plasma immersion ion implantation and deposition (PIIID) using a modified hybrid gas-metal cathodic arc plasma source and with no intentional heating to the substrate. The mixed metal and gaseous plasma is generated by feeding the gas into the arc discharge region. The deposition rate is found to mainly depend on the Al ion flux from the cathodic arc source and is only slightly affected by the N 2 flow rate. The AlN films fabricated by this method exhibit a cubic crystalline microstructure with stable and low internal stress. The surface of the AlN films is quite smooth with the surface roughness on the order of 1/2 nm as determined by atomic force microscopy, homogeneous, and continuous, and the dense granular microstructures give rise to good adhesion with the substrate. The N to Al ratio increases with the bias voltage applied to the substrates. A fairly large amount of O originating from the residual vacuum is found in the samples with low N:Al ratios, but a high bias reduces the oxygen concentration. The compositions, microstructures and crystal states of the deposited films are quite stable and remain unchanged after annealing at 800 deg. C for 1 h. Our hybrid gas-metal source cathodic arc source delivers better AlN thin films than conventional PIIID employing dual plasmas

Atmospheric heavy metal deposition in Europe estimated by moss analysis

Energy Technology Data Exchange (ETDEWEB)

Ruehling, Aa. [Swedish Environmental Research Inst., Lund (Sweden). Dept. of Ecology

1995-12-31

Atmospheric heavy metal deposition in Europe including 21 countries was monitored in 1990-1992 by the moss technique. This technique is based on the fact that the concentrations of heavy metals in moss are closely correlated to atmospheric deposition. This was the first attempt to map heavy metal deposition in this large area. The objectives of the project were to characterise qualitatively and quantitatively the regional atmospheric deposition pattern of heavy metals in background areas in Europe, to indicate the location of important heavy metal pollution sources and to allow retrospective comparisons with similar studies. The present survey is a follow-up of a joint Danish and Swedish project in 1980 and an extended survey in 1985 within the framework of the Nordic Council of Ministers. In Sweden, heavy-metal deposition was first mapped on a nation-wide scale in 1968-1971 and 1975. (author)

Atmospheric heavy metal deposition in Europe estimated by moss analysis

Energy Technology Data Exchange (ETDEWEB)

Ruehling, Aa [Swedish Environmental Research Inst., Lund (Sweden). Dept. of Ecology

1996-12-31

Atmospheric heavy metal deposition in Europe including 21 countries was monitored in 1990-1992 by the moss technique. This technique is based on the fact that the concentrations of heavy metals in moss are closely correlated to atmospheric deposition. This was the first attempt to map heavy metal deposition in this large area. The objectives of the project were to characterise qualitatively and quantitatively the regional atmospheric deposition pattern of heavy metals in background areas in Europe, to indicate the location of important heavy metal pollution sources and to allow retrospective comparisons with similar studies. The present survey is a follow-up of a joint Danish and Swedish project in 1980 and an extended survey in 1985 within the framework of the Nordic Council of Ministers. In Sweden, heavy-metal deposition was first mapped on a nation-wide scale in 1968-1971 and 1975. (author)

Low-Vacuum Deposition of Glutamic Acid and Pyroglutamic Acid: A Facile Methodology for Depositing Organic Materials beyond Amino Acids.

Science.gov (United States)

Sugimoto, Iwao; Maeda, Shunsaku; Suda, Yoriko; Makihara, Kenji; Takahashi, Kazuhiko

2014-01-01

Thin layers of pyroglutamic acid (Pygl) have been deposited by thermal evaporation of the molten L-glutamic acid (L-Glu) through intramolecular lactamization. This deposition was carried out with the versatile handmade low-vacuum coater, which was simply composed of a soldering iron placed in a vacuum degassing resin chamber evacuated by an oil-free diaphragm pump. Molecular structural analyses have revealed that thin solid film evaporated from the molten L-Glu is mainly composed of L-Pygl due to intramolecular lactamization. The major component of the L-Pygl was in β-phase and the minor component was in γ-phase, which would have been generated from partial racemization to DL-Pygl. Electron microscopy revealed that the L-Glu-evaporated film generally consisted of the 20 nm particulates of Pygl, which contained a periodic pattern spacing of 0.2 nm intervals indicating the formation of the single-molecular interval of the crystallized molecular networks. The DL-Pygl-evaporated film was composed of the original DL-Pygl preserving its crystal structures. This methodology is promising for depositing a wide range of the evaporable organic materials beyond amino acids. The quartz crystal resonator coated with the L-Glu-evaporated film exhibited the pressure-sensing capability based on the adsorption-desorption of the surrounding gas at the film surface.

State-of-the-art of recycling e-wastes by vacuum metallurgy separation.

Science.gov (United States)

Zhan, Lu; Xu, Zhenming

2014-12-16

In recent era, more and more electric and electronic equipment wastes (e-wastes) are generated that contain both toxic and valuable materials in them. Most studies focus on the extraction of valuable metals like Au, Ag from e-wastes. However, the recycling of metals such as Pb, Cd, Zn, and organics has not attracted enough attentions. Vacuum metallurgy separation (VMS) processes can reduce pollution significantly using vacuum technique. It can effectively recycle heavy metals and organics from e-wastes in an environmentally friendly way, which is beneficial for both preventing the heavy metal contaminations and the sustainable development of resources. VMS can be classified into several methods, such as vacuum evaporation, vacuum carbon reduction and vacuum pyrolysis. This paper respectively reviews the state-of-art of these methods applied to recycling heavy metals and organics from several kinds of e-wastes. The method principle, equipment used, separating process, optimized operating parameters and recycling mechanism of each case are illustrated in details. The perspectives on the further development of e-wastes recycling by VMS are also presented.

Study on a Salt Evaporation of the Uranium Deposits from an Electro-refiner

International Nuclear Information System (INIS)

Sung Bin Park; Dong Wook Cho; Gyu Hwan Oh; Jong Hyeon Lee; Sung Chan Hwang; Young Ho Kang; Han Soo Lee; Eung Ho Kim; Seong Won Park

2008-01-01

Uranium metal is electrodeposited onto a solid cathode during the electrorefining process. Uranium deposits from an electro-refiner contain about 30∼40 wt% salts. In order to recover pure uranium and transform it into metal ingots, the salts have to be removed. A salt distiller is adapted for a salt evaporation. A batch operation for the salt removal is carried out by a heating and vacuum evaporation. It is operated at 700 ∼ 1000 deg. C and less than 1 Torr, respectively. The behaviors of the salt evaporations were investigated by focusing on the effects of the vacuum pressure and the holding temperature on the salt distillation. The salt removal efficiencies were obtained with regards to the operational conditions. The Hertz-Langmuir relation was applied to the experimental results of the salt evaporations. The effective evaporation coefficients of the relation were obtained with regards to the operational conditions. The lower the vacuum pressure and the higher the holding temperature were, the higher the removal efficiencies of the salts were. (authors)

Fermi level pinning in metal/Al{sub 2}O{sub 3}/InGaAs gate stack after post metallization annealing

Energy Technology Data Exchange (ETDEWEB)

Winter, R.; Krylov, I.; Cytermann, C.; Eizenberg, M. [Department of Materials Science and Engineering, Technion—Israel Institute of Technology, Haifa 32000 (Israel); Tang, K.; Ahn, J.; McIntyre, P. C. [Department of Materials Science and Engineering, Stanford University, Stanford, California 94305 (United States)

2015-08-07

The effect of post metal deposition annealing on the effective work function in metal/Al{sub 2}O{sub 3}/InGaAs gate stacks was investigated. The effective work functions of different metal gates (Al, Au, and Pt) were measured. Flat band voltage shifts for these and other metals studied suggest that their Fermi levels become pinned after the post-metallization vacuum annealing. Moreover, there is a difference between the measured effective work functions of Al and Pt, and the reported vacuum work function of these metals after annealing. We propose that this phenomenon is caused by charging of indium and gallium induced traps at the annealed metal/Al{sub 2}O{sub 3} interface.

Carbide-reinforced metal matrix composite by direct metal deposition

Science.gov (United States)

Novichenko, D.; Thivillon, L.; Bertrand, Ph.; Smurov, I.

Direct metal deposition (DMD) is an automated 3D laser cladding technology with co-axial powder injection for industrial applications. The actual objective is to demonstrate the possibility to produce metal matrix composite objects in a single-step process. Powders of Fe-based alloy (16NCD13) and titanium carbide (TiC) are premixed before cladding. Volume content of the carbide-reinforced phase is varied. Relationships between the main laser cladding parameters and the geometry of the built-up objects (single track, 2D coating) are discussed. On the base of parametric study, a laser cladding process map for the deposition of individual tracks was established. Microstructure and composition of the laser-fabricated metal matrix composite objects are examined. Two different types of structures: (a) with the presence of undissolved and (b) precipitated titanium carbides are observed. Mechanism of formation of diverse precipitated titanium carbides is studied.

Metallic Na formation in NaCl crystals with irradiation of electron or vacuum ultraviolet photon

Energy Technology Data Exchange (ETDEWEB)

Owaki, Shigehiro [Osaka Prefecture Univ., Sakai, Osaka (Japan). Coll. of Integrated Arts and Sciences; Koyama, Shigeko; Takahashi, Masao; Kamada, Masao; Suzuki, Ryouichi

1997-03-01

Metallic Na was formed in NaCl single crystals with irradiation of a variety of radiation sources and analyzed the physical states with several methods. In the case of irradiation of 21 MeV electron pulses to the crystal blocks, the optical absorption and lifetime measurement of positron annihilation indicated appearance of Na clusters inside. Radiation effects of electron beam of 30 keV to the crystals in vacuum showed the appearance of not only metallic Na but atomic one during irradiation with Auger electron spectroscopy. Intense photon fluxes in vacuum ultraviolet region of synchrotron radiation were used as another source and an analyzing method of ultraviolet photoelectron spectroscopy. The results showed the metallic Na layered so thick that bulk plasmon can exist. (author)

Wafer-scale laser lithography. I. Pyrolytic deposition of metal microstructures

International Nuclear Information System (INIS)

Herman, I.P.; Hyde, R.A.; McWilliams, B.M.; Weisberg, A.H.; Wood, L.L.

1982-01-01

Mechanisms for laser-driven pyrolytic deposition of micron-scale metal structures on crystalline silicon have been studied. Models have been developed to predict temporal and spatial propeties of laser-induced pyrolytic deposition processes. An argon ion laser-based apparatus has been used to deposit metal by pyrolytic decomposition of metal alkyl and carbonyl compounds, in order to evaluate the models. These results of these studies are discussed, along with their implications for the high-speed creation of micron-scale metal structures in ultra-large scale integrated circuit systems. 4 figures

High mobility single-crystalline-like GaAs thin films on inexpensive flexible metal substrates by metal-organic chemical vapor deposition

International Nuclear Information System (INIS)

Dutta, P.; Rathi, M.; Gao, Y.; Yao, Y.; Selvamanickam, V.; Zheng, N.; Ahrenkiel, P.; Martinez, J.

2014-01-01

We demonstrate heteroepitaxial growth of single-crystalline-like n and p-type doped GaAs thin films on inexpensive, flexible, and light-weight metal foils by metal-organic chemical vapor deposition. Single-crystalline-like Ge thin film on biaxially textured templates made by ion beam assisted deposition on metal foil served as the epitaxy enabling substrate for GaAs growth. The GaAs films exhibited strong (004) preferred orientation, sharp in-plane texture, low grain misorientation, strong photoluminescence, and a defect density of ∼10 7  cm −2 . Furthermore, the GaAs films exhibited hole and electron mobilities as high as 66 and 300 cm 2 /V-s, respectively. High mobility single-crystalline-like GaAs thin films on inexpensive metal substrates can pave the path for roll-to-roll manufacturing of flexible III-V solar cells for the mainstream photovoltaics market.

High mobility single-crystalline-like GaAs thin films on inexpensive flexible metal substrates by metal-organic chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Dutta, P., E-mail: pdutta2@central.uh.edu; Rathi, M.; Gao, Y.; Yao, Y.; Selvamanickam, V. [Department of Mechanical Engineering, University of Houston, Houston, Texas 77204 (United States); Zheng, N.; Ahrenkiel, P. [Department of Nanoscience and Nanoengineering, South Dakota School of Mines and Technology, Rapid City, South Dakota 57701 (United States); Martinez, J. [Materials Evaluation Laboratory, NASA Johnson Space Center, Houston, Texas 77085 (United States)

2014-09-01

We demonstrate heteroepitaxial growth of single-crystalline-like n and p-type doped GaAs thin films on inexpensive, flexible, and light-weight metal foils by metal-organic chemical vapor deposition. Single-crystalline-like Ge thin film on biaxially textured templates made by ion beam assisted deposition on metal foil served as the epitaxy enabling substrate for GaAs growth. The GaAs films exhibited strong (004) preferred orientation, sharp in-plane texture, low grain misorientation, strong photoluminescence, and a defect density of ∼10{sup 7 }cm{sup −2}. Furthermore, the GaAs films exhibited hole and electron mobilities as high as 66 and 300 cm{sup 2}/V-s, respectively. High mobility single-crystalline-like GaAs thin films on inexpensive metal substrates can pave the path for roll-to-roll manufacturing of flexible III-V solar cells for the mainstream photovoltaics market.

UV laser deposition of metal films by photogenerated free radicals

Science.gov (United States)

Montgomery, R. K.; Mantei, T. D.

1986-01-01

A novel photochemical method for liquid-phase deposition of metal films is described. In the liquid phase deposition scheme, a metal containing compound and a metal-metal bonded carbonyl complex are dissolved together in a polar solvent and the mixture is irradiated using a UV laser. The optical arrangement consists of a HeCd laser which provides 7 mW of power at a wavelength of 325 nm in the TEM(OO) mode. The beam is attenuated and may be expanded to a diameter of 5-20 mm. Experiments with photochemical deposition of silver films onto glass and quartz substrates are described in detail. Mass spectrometric analysis of deposited silver films indicated a deposition rate of about 1 A/s at incident power levels of 0.01 W/sq cm. UV laser-induced copper and palladium films have also been obtained. A black and white photograph showing the silver Van Der Pauw pattern of a solution-deposited film is provided.

Mimicking Martian dust: An in-vacuum dust deposition system for testing the ultraviolet sensors on the Curiosity rover

International Nuclear Information System (INIS)

Sobrado, J. M.; Martín-Soler, J.; Martín-Gago, J. A.

2015-01-01

We have designed and developed an in-vacuum dust deposition system specifically conceived to simulate and study the effect of accumulation of Martian dust on the electronic instruments of scientific planetary exploration missions. We have used this device to characterize the dust effect on the UV sensor of the Rover Environmental Monitoring Station in the Mars science Laboratory mission of NASA in similar conditions to those found on Mars surface. The UV sensor includes six photodiodes for measuring the radiation in all UV wavelengths (direct incidence and reflected); it is placed on the body of Curiosity rover and it is severely affected by the dust deposited on it. Our experimental setup can help to estimate the duration of reliable reading of this instrument during operation. We have used an analogous of the Martian dust in chemical composition (magnetic species), color, and density, which has been characterized by X-ray spectroscopy. To ensure a Brownian motion of the dust during its fall and a homogeneous coverage on the instrumentation, the operating conditions of the vacuum vessel, determined by partial pressures and temperature, have to be modified to account for the different gravities of Mars with respect to Earth. We propose that our designed device and operational protocol can be of interest to test optoelectronic instrumentation affected by the opacity of dust, as can be the degradation of UV photodiodes in planetary exploration

Mimicking Martian dust: An in-vacuum dust deposition system for testing the ultraviolet sensors on the Curiosity rover

Energy Technology Data Exchange (ETDEWEB)

Sobrado, J. M., E-mail: sobradovj@inta.es; Martín-Soler, J. [Centro de Astrobiología (CAB), INTA-CSIC, Torrejón de Ardoz, 28850 Madrid (Spain); Martín-Gago, J. A. [Centro de Astrobiología (CAB), INTA-CSIC, Torrejón de Ardoz, 28850 Madrid (Spain); Instituto de Ciencias de Materiales de Madrid (ICMM–CSIC), Cantoblanco, 28049 Madrid (Spain)

2015-10-15

We have designed and developed an in-vacuum dust deposition system specifically conceived to simulate and study the effect of accumulation of Martian dust on the electronic instruments of scientific planetary exploration missions. We have used this device to characterize the dust effect on the UV sensor of the Rover Environmental Monitoring Station in the Mars science Laboratory mission of NASA in similar conditions to those found on Mars surface. The UV sensor includes six photodiodes for measuring the radiation in all UV wavelengths (direct incidence and reflected); it is placed on the body of Curiosity rover and it is severely affected by the dust deposited on it. Our experimental setup can help to estimate the duration of reliable reading of this instrument during operation. We have used an analogous of the Martian dust in chemical composition (magnetic species), color, and density, which has been characterized by X-ray spectroscopy. To ensure a Brownian motion of the dust during its fall and a homogeneous coverage on the instrumentation, the operating conditions of the vacuum vessel, determined by partial pressures and temperature, have to be modified to account for the different gravities of Mars with respect to Earth. We propose that our designed device and operational protocol can be of interest to test optoelectronic instrumentation affected by the opacity of dust, as can be the degradation of UV photodiodes in planetary exploration.

Tribological coatings for complex mechanical elements produced by supersonic cluster beam deposition of metal dichalcogenide nanoparticles

Science.gov (United States)

Piazzoni, C.; Buttery, M.; Hampson, M. R.; Roberts, E. W.; Ducati, C.; Lenardi, C.; Cavaliere, F.; Piseri, P.; Milani, P.

2015-07-01

Fullerene-like MoS2 and WS2 nanoparticles can be used as building blocks for the fabrication of fluid and solid lubricants. Metal dichalcogenide films have a very low friction coefficient in vacuum, therefore they have mostly been used as solid lubricants in space and vacuum applications. Unfortunately, their use is significantly hampered by the fact that in the presence of humidity, oxygen and moisture, the low-friction properties of these materials rapidly degrade due to oxidation. The use of closed-cage MoS2 and WS2 nanoparticles may eliminate this problem, although the fabrication of lubricant thin films starting from dichalcogenide nanoparticles is, to date, a difficult task. Here we demonstrate the use of supersonic cluster beam deposition for the coating of complex mechanical elements (angular contact ball bearings) with nanostructured MoS2 and WS2 thin films. We report structural and tribological characterization of the coatings in view of the optimization of tribological performances for aerospace applications.

In-situ deposition of sacrificial layers during ion implantation

International Nuclear Information System (INIS)

Anders, A.; Anders, S.; Brown, I.G.; Yu, K.M.

1995-02-01

The retained dose of implanted ions is limited by sputtering. It is known that a sacrificial layer deposited prior to ion implantation can lead to an enhanced retained dose. However, a higher ion energy is required to obtain a similar implantation depth due to the stopping of ions in the sacrificial layer. It is desirable to have a sacrificial layer of only a few monolayers thickness which can be renewed after it has been sputtered away. We explain the concept and describe two examples: (i) metal ion implantation using simultaneously a vacuum arc ion source and filtered vacuum arc plasma sources, and (ii) Metal Plasma Immersion Ion Implantation and Deposition (MePIIID). In MePIIID, the target is immersed in a metal or carbon plasma and a negative, repetitively pulsed bias voltage is applied. Ions are implanted when the bias is applied while the sacrificial layer suffers sputtering. Low-energy thin film deposition - repair of the sacrificial layer -- occurs between bias pulses. No foreign atoms are incorporated into the target since the sacrificial film is made of the same ion species as used in the implantation phase

Metal Matrix Composite Material by Direct Metal Deposition

Science.gov (United States)

Novichenko, D.; Marants, A.; Thivillon, L.; Bertrand, P. H.; Smurov, I.

Direct Metal Deposition (DMD) is a laser cladding process for producing a protective coating on the surface of a metallic part or manufacturing layer-by-layer parts in a single-step process. The objective of this work is to demonstrate the possibility to create carbide-reinforced metal matrix composite objects. Powders of steel 16NCD13 with different volume contents of titanium carbide are tested. On the base of statistical analysis, a laser cladding processing map is constructed. Relationships between the different content of titanium carbide in a powder mixture and the material microstructure are found. Mechanism of formation of various precipitated titanium carbides is investigated.

Metals distribution in Kumkol deposit petroleum

International Nuclear Information System (INIS)

Musaeva, Z.G.; Nadirov, A.N.; Ajdarbaev, A.S.

1997-01-01

Metals content in samples of Kumkol deposit petroleum is determined by the method of X-ray diffraction and neutron activation analysis. Specific consideration was devoted to nickel and vanadium. It is possible, that sources of these metals are various petroleum formation as well as both the absorbed or the got in stratum microelements. (author)

The influence of hydrogen on the fatigue life of metallic leaf spring components in a vacuum environment

NARCIS (Netherlands)

Kouters, M.H.M.; Slot, H.M.; Zwieten, W. van; Veer, J. van der

2014-01-01

Hydrogen is used as a process gas in vacuum environments for semiconductor manufacturing equipment. If hydrogen dissolves in metallic components during operation it can result in hydrogen embrittlement. In order to assess if hydrogen embrittlement occurs in such a vacuum environment a special

Nanosecond laser ablation and deposition of silver, copper, zinc and tin

DEFF Research Database (Denmark)

Cazzaniga, Andrea Carlo; Ettlinger, Rebecca Bolt; Canulescu, Stela

2014-01-01

Nanosecond pulsed laser deposition of different metals (Ag, Cu, Sn, Zn) has been studied in high vacuum at a laser wavelength of 355 nm and pulse length of 6 ns. The deposition rate is roughly similar for Sn, Cu and Ag, which have comparable cohesive energies, and much higher for the deposition...... of Zn which has a low cohesive energy. The deposition rate for all metals is strongly correlated with the total ablation yield, i.e., the total mass ablated per pulse, reported in the literature except for Sn, for which the deposition rate is low, but the total ablation yield is high. This may...... be explained by the continuous erosion by nanoparticles during deposition of the Sn films which appear to have a much rougher surface than those of the other metals studied in the present work....

Vacuum exhaust duct used for thermonuclear device

International Nuclear Information System (INIS)

Tachikawa, Nobuo; Kondo, Mitsuaki; Honda, Tsutomu.

1990-01-01

The present invention concerns a vacuum exhaust duct used for a thermonuclear device. A cylindrical metal liners is lined with a gap to the inside of a vacuum exhaust duct main body. Bellows are connected to both ends of the metal liners and the end of the bellows is welded to the vacuum exhaust duct main body. Futher, a heater is mounted to the metal liner on the side of the vacuum exhaust duct main body, and the metal liner is heated by the heater to conduct baking for the vacuum exhaust duct main body. Accordingly, since there is no requirement for elevating the temperature of the vacuum exhaust duct upon conducting baking, the vacuum exhaust duct scarcely suffers substantial deformation due to heat expansion. Further, there is also no substantial deformation for the bellows disposed between the outer circumference of the vacuum vessel and a portion of a vacuum exhaust duct, so that the durability of the bellows is greatly improved. (I.S.)

Investigation of TiN thin film oxidation depending on the substrate temperature at vacuum break

Energy Technology Data Exchange (ETDEWEB)

Piallat, Fabien, E-mail: fabien.piallat@gmail.com [STMicroelectronics, 850 rue Jean Monnet, 38920 Crolles (France); CEA, LETI, Campus Minatec, F-38054 Grenoble (France); LTM-CNRS, 17 rue des Martyrs, 38054 Grenoble (France); Gassilloud, Remy [CEA, LETI, Campus Minatec, F-38054 Grenoble (France); Caubet, Pierre [STMicroelectronics, 850 rue Jean Monnet, 38920 Crolles (France); Vallée, Christophe [LTM-CNRS, 17 rue des Martyrs, 38054 Grenoble (France)

2016-09-15

Due to the reduction of the thickness of the layers used in the advanced technology nodes, there is a growing importance of the surface phenomena in the definition of the general properties of the materials. One of the least controlled and understood phenomenon is the oxidation of metals after deposition, at the vacuum break. In this study, the influence of the sample temperature at vacuum break on the oxidation level of TiN deposited by metalorganic chemical vapor deposition is investigated. TiN resistivity appears to be lower for samples which underwent vacuum break at high temperature. Using X-ray photoelectron spectrometry analysis, this change is correlated to the higher oxidation of the TiN layer. Moreover, angle resolved XPS analysis reveals that higher is the temperature at the vacuum break, higher is the surface oxidation of the sample. This surface oxidation is in turn limiting the diffusion of oxygen in the volume of the layer. Additionally, evolution of TiN layers resistivity was monitored in time and it shows that resistivity increases until a plateau is reached after about 10 days, with the lowest temperature at vacuum break resulting in the highest increase, i.e., the resistivity of the sample released to atmosphere at high temperature increased by a factor 1.7 whereas the resistivity of the sample cooled down under vacuum temperature increased by a factor 2.7.

Depth Profiling Analysis of Aluminum Oxidation During Film Deposition in a Conventional High Vacuum System

Science.gov (United States)

Kim, Jongmin; Weimer, Jeffrey J.; Zukic, Muamer; Torr, Douglas G.

1994-01-01

The oxidation of aluminum thin films deposited in a conventional high vacuum chamber has been investigated using x-ray photoelectron spectroscopy (XPS) and depth profiling. The state of the Al layer was preserved by coating it with a protective MgF2 layer in the deposition chamber. Oxygen concentrations in the film layers were determined as a function of sputter time (depth into the film). The results show that an oxidized layer is formed at the start of Al deposition and that a less extensively oxidized Al layer is deposited if the deposition rate is fast. The top surface of the Al layer oxidizes very quickly. This top oxidized layer may be thicker than has been previously reported by optical methods. Maximum oxygen concentrations measured by XPS at each Al interface are related to pressure to rate ratios determined during the Al layer deposition.

Influence of substrate bias on the structure and properties of (Ti, Al)N films deposited by filtered cathodic vacuum arc

International Nuclear Information System (INIS)

Cheng, Y.H.; Tay, B.K.; Lau, S.P.; Shi, X.

2001-01-01

(Ti, Al)N films were deposited by an off-plane, double-bend, filtered cathodic vacuum arc technique in N 2 atmosphere at room temperature. The (Ti, Al)N films deposited are atomically smooth. The influence of substrate negative bias at the wide range (0-1000 V) on the deposition rate, surface morphology, crystal structure, internal stress, and mechanical properties of (Ti, Al)N films were systematically studied. Increasing substrate bias results in the decrease of deposition rate and the increase of surface roughness monotonically. At the bias of 0 V, (Ti, Al)N films are amorphous, and the internal stress, hardness, and Young's modulus for the deposited films are fairly low. With increasing substrate bias to 200 V, single-phase face-centered cubic-type nanocrystalline (Ti, Al)N films can be obtained, and the internal stress, hardness, and Young's modulus increase to the maximum of 7 GPa, 28 GPa, and 240 GPa, respectively. Further increase of substrate bias results in the decrease of intensity and the broadening of x-ray diffraction lines, and the gradual decrease of internal stress, hardness, and Young's modulus in (Ti, Al)N films

The Formation of Composite Ti-Al-N Coatings Using Filtered Vacuum Arc Deposition with Separate Cathodes

Directory of Open Access Journals (Sweden)

Ivan A. Shulepov

2017-11-01

Full Text Available Ti-Al-N coatings were deposited on high-speed steel substrates by filtered vacuum arc deposition (FVAD during evaporation of aluminum and titanium cathodes. Distribution of elements, phase composition, and mechanical properties of Ti-Al-N coatings were investigated using Auger electron spectroscopy (AES, X-ray diffraction (XRD, transmission electron microscopy (TEM and nanoindentation, respectively. Additionally, tribological tests and scratch tests of the coatings were performed. The stoichiometry of the coating changes from Ti0.6Al0.4N to Ti0.48Al0.52N with increasing aluminum arc current from 70 A to 90 A, respectively. XRD and TEM showed only face-centered cubic Ti-Al-N phase with preferred orientation of the crystallites in (220 direction with respect to the sample normal and without precipitates of AlN or intermetallics inside the coatings. Incorporation of Al into the TiN lattice caused shifting of the (220 reflex to a higher 2θ angle with increasing Al content. Low content and size of microdroplets were obtained using coaxial plasma filters, which provides good mechanical and tribological properties of the coatings. The highest value of microhardness (36 GPa and the best wear-resistance were achieved for the coating with higher Al content, thus for Ti0.48Al0.52N. These coatings exhibit good adhesive properties up to 30 N load in the scratch tests.

Cotton fabrics with UV blocking properties through metal salts deposition

International Nuclear Information System (INIS)

Emam, Hossam E.; Bechtold, Thomas

2015-01-01

Graphical abstract: - Highlights: • Introducing metal salt based UV-blocking properties into cotton fabric. • A quite simple technique used to produce wash resistant UV-absorbers using different Cu-, Zn- and Ti-salts. • Good UPF was obtained after treatment with Cu and Ti salts, and ranged between 11.6 and 14. • The efficiency of the deposited metal oxides is compared on molar basis. - Abstract: Exposure to sunlight is important for human health as this increases the resistance to diverse pathogens, but the higher doses cause skin problems and diseases. Hence, wearing of sunlight protective fabrics displays a good solution for people working in open atmosphere. The current study offered quite simple and technically feasible ways to prepare good UV protection fabrics based on cotton. Metal salts including Zn, Cu and Ti were immobilized into cotton and oxidized cotton fabrics by using pad-dry-cure technique. Metal contents on fabrics were determined by AAS; the highest metal content was recorded for Cu-fabric and it was 360.6 mmol/kg after treatment of oxidized cotton with 0.5 M of copper nitrate. Ti contents on fabrics were ranged between 168.0 and 200.8 mmol/kg and it showed the lowest release as only 38.1–46.4% leached out fabrics after five laundry washings. Metal containing deposits were specified by scanning electron microscopy and energy dispersive X-ray spectroscopy. UV-transmission radiation over treated fabrics was measured and ultraviolet protection factor (UPF) was calculated. UPF was enhanced after treatment with Cu and Ti salts to be 11.6 and 14, respectively. After five washings, the amount of metal (Cu or Ti) retained indicates acceptable laundering durability.

A comparison of surface properties of metallic thin film photocathodes

CERN Document Server

Mistry, Sonal; Valizadeh, Reza; Jones, L.B; Middleman, Keith; Hannah, Adrian; Militsyn, B.L; Noakes, Tim

2017-01-01

In this work the preparation of metal photocathodes by physical vapour deposition magnetron sputtering has been employed to deposit metallic thin films onto Cu, Mo and Si substrates. The use of metallic cathodes offers several advantages: (i) metal photocathodes present a fast response time and a relative insensitivity to the vacuum environment (ii) metallic thin films when prepared and transferred in vacuum can offer smoother and cleaner emitting surfaces. The photocathodes developed here will ultimately be used in S-band Normal Conducting RF (NCRF) guns such as that used in VELA (Versatile Electron Linear Accelerator) and the proposed CLARA (Compact Linear Accelerator for Research and Applications) Free Electron Laser test facility. The samples grown on Si substrates were used to investigate the morphology and thickness of the film. The samples grown onto Cu and Mo substrates were analysed and tested as photocathodes in a surface characterisation chamber, where X-Ray Photoelectron spectroscopy (XPS) was emp...

Pure high dose metal ion implantation using the plasma immersion technique

International Nuclear Information System (INIS)

Zhang, T.; Tang, B.Y.; Zeng, Z.M.; Kwok, T.K.; Chu, P.K.; Monteiro, O.R.; Brown, I.G.

1999-01-01

High energy implantation of metal ions can be carried out using conventional ion implantation with a mass-selected ion beam in scanned-spot mode by employing a broad-beam approach such as with a vacuum arc ion source, or by utilizing plasma immersion ion implantation with a metal plasma. For many high dose applications, the use of plasma immersion techniques offers a high-rate process, but the formation of a surface film along with the subsurface implanted layer is sometimes a severe or even fatal detriment. We describe here an operating mode of the metal plasma immersion approach by which pure implantation can be obtained. We have demonstrated the technique by carrying out Ti and Ta implantations at energies of about 80 and 120 keV for Ti and Ta, respectively, and doses on the order of 1x10 17 ions/cm 2 . Our experiments show that virtually pure implantation without simultaneous surface deposition can be accomplished. Using proper synchronization of the metal arc and sample voltage pulse, the applied dose that deposits as a film versus the part that is energetically implanted (the deposition-to-implantation ratio) can be precisely controlled.copyright 1999 American Institute of Physics

Method for calculating the duration of vacuum drying of a metal-concrete container for spent nuclear fuel

Science.gov (United States)

Karyakin, Yu. E.; Nekhozhin, M. A.; Pletnev, A. A.

2013-07-01

A method for calculating the quantity of moisture in a metal-concrete container in the process of its charging with spent nuclear fuel is proposed. A computing method and results obtained by it for conservative estimation of the time of vacuum drying of a container charged with spent nuclear fuel by technologies with quantization and without quantization of the lower fuel element cluster are presented. It has been shown that the absence of quantization in loading spent fuel increases several times the time of vacuum drying of the metal-concrete container.

Half-sandwich cobalt complexes in the metal-organic chemical vapor deposition process

Energy Technology Data Exchange (ETDEWEB)

Georgi, Colin [Technische Universität Chemnitz, Faculty of Natural Science, Institute of Chemistry, Inorganic Chemistry, Chemnitz 09107 (Germany); Hapke, Marko; Thiel, Indre [Leibniz-Institut für Katalyse e.V. an der Universität Rostock (LIKAT), Albert-Einstein-Straße 29a, Rostock 18059 (Germany); Hildebrandt, Alexander [Technische Universität Chemnitz, Faculty of Natural Science, Institute of Chemistry, Inorganic Chemistry, Chemnitz 09107 (Germany); Waechtler, Thomas; Schulz, Stefan E. [Fraunhofer Institute of Electronic Nano Systems (ENAS), Technologie-Campus 3, Chemnitz 09126 (Germany); Technische Universität Chemnitz, Center for Microtechnologies (ZfM), Chemnitz 09107 (Germany); Lang, Heinrich, E-mail: heinrich.lang@chemie.tu-chemnitz.de [Technische Universität Chemnitz, Faculty of Natural Science, Institute of Chemistry, Inorganic Chemistry, Chemnitz 09107 (Germany)

2015-03-02

A series of cobalt half-sandwich complexes of type [Co(η{sup 5}-C{sub 5}H{sub 5})(L)(L′)] (1: L, L′ = 1,5-hexadiene; 2: L = P(OEt){sub 3}, L′ = H{sub 2}C=CHSiMe{sub 3}; 3: L = L′ = P(OEt){sub 3}) has been studied regarding their physical properties such as the vapor pressure, decomposition temperature and applicability within the metal-organic chemical vapor deposition (MOCVD) process, with a focus of the influence of the phosphite ligands. It could be shown that an increasing number of P(OEt){sub 3} ligands increases the vapor pressure and thermal stability of the respective organometallic compound. Complex 3 appeared to be a promising MOCVD precursor with a high vapor pressure and hence was deposited onto Si/SiO{sub 2} (100 nm) substrates. The resulting reflective layer is closed, dense and homogeneous, with a slightly granulated surface morphology. X-ray photoelectron spectroscopy (XPS) studies demonstrated the formation of metallic cobalt, cobalt phosphate, cobalt oxide and cobalt carbide. - Highlights: • Thermal studies and vapor pressure measurements of cobalt half-sandwich complexes was carried out. • Chemical vapor deposition with cobalt half-sandwich complexes is reported. • The use of Co-phosphites results in significant phosphorous-doped metallic layers.

Corrosion processes of physical vapor deposition-coated metallic implants.

Science.gov (United States)

Antunes, Renato Altobelli; de Oliveira, Mara Cristina Lopes

2009-01-01

Protecting metallic implants from the harsh environment of physiological fluids is essential to guaranteeing successful long-term use in a patient's body. Chemical degradation may lead to the failure of an implant device in two different ways. First, metal ions may cause inflammatory reactions in the tissues surrounding the implant and, in extreme cases, these reactions may inflict acute pain on the patient and lead to loosening of the device. Therefore, increasing wear strength is beneficial to the performance of the metallic implant. Second, localized corrosion processes contribute to the nucleation of fatigue cracks, and corrosion fatigue is the main reason for the mechanical failure of metallic implants. Common biomedical alloys such as stainless steel, cobalt-chrome alloys, and titanium alloys are prone to at least one of these problems. Vapor-deposited hard coatings act directly to improve corrosion, wear, and fatigue resistances of metallic materials. The effectiveness of the corrosion protection is strongly related to the structure of the physical vapor deposition layer. The aim of this paper is to present a comprehensive review of the correlation between the structure of physical vapor deposition layers and the corrosion properties of metallic implants.

Depositing nanometer-sized particles of metals onto carbon allotropes

Science.gov (United States)

Watson, Kent A. (Inventor); Fallbach, Michael J. (Inventor); Ghose, Sayata (Inventor); Smith, Joseph G. (Inventor); Delozier, Donavon M. (Inventor); Connell, John W. (Inventor)

2010-01-01

A process for depositing nanometer-sized metal particles onto a substrate in the absence of aqueous solvents, organic solvents, and reducing agents, and without any required pre-treatment of the substrate, includes preparing an admixture of a metal compound and a substrate by dry mixing a chosen amount of the metal compound with a chosen amount of the substrate; and supplying energy to the admixture in an amount sufficient to deposit zero valance metal particles onto the substrate. This process gives rise to a number of deposited metallic particle sizes which may be controlled. The compositions prepared by this process are used to produce polymer composites by combining them with readily available commodity and engineering plastics. The polymer composites are used as coatings, or they are used to fabricate articles, such as free-standing films, fibers, fabrics, foams, molded and laminated articles, tubes, adhesives, and fiber reinforced articles. These articles are well-suited for many applications requiring thermal conductivity, electrical conductivity, antibacterial activity, catalytic activity, and combinations thereof.

Metallic Conductive Nanowires Elaborated by PVD Metal Deposition on Suspended DNA Bundles.

Science.gov (United States)

Brun, Christophe; Elchinger, Pierre-Henri; Nonglaton, Guillaume; Tidiane-Diagne, Cheikh; Tiron, Raluca; Thuaire, Aurélie; Gasparutto, Didier; Baillin, Xavier

2017-09-01

Metallic conductive nanowires (NWs) with DNA bundle core are achieved, thanks to an original process relying on double-stranded DNA alignment and physical vapor deposition (PVD) metallization steps involving a silicon substrate. First, bundles of DNA are suspended with a repeatable process between 2 µm high parallel electrodes with separating gaps ranging from 800 nm to 2 µm. The process consists in the drop deposition of a DNA lambda-phage solution on the electrodes followed by a naturally evaporation step. The deposition process is controlled by the DNA concentration within the buffer solution, the drop volume, and the electrode hydrophobicity. The suspended bundles are finally metallized with various thicknesses of titanium and gold by a PVD e-beam evaporation process. The achieved NWs have a width ranging from a few nanometers up to 100 nm. The electrical behavior of the achieved 60 and 80 nm width metallic NWs is shown to be Ohmic and their intrinsic resistance is estimated according to different geometrical models of the NW section area. For the 80 nm width NWs, a resistance of about few ohms is established, opening exploration fields for applications in microelectronics. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

The dependence of the texture of tellurium thin films on vacuum deposition angle

International Nuclear Information System (INIS)

Cocks, F.H.; Peterson, M.J.; Jones, P.L.

1980-01-01

Vacuum-deposited tellurium thin films can show substantially different surface morphologies depending on the angle with which the vapor stream impinges on the substrate surface. These tellurium thin films have a tendency to grow as acicular crystallites but as the deposition angle is increased so that the vapor stream becomes tangential to the substrate surface the spacing between crystallites increases and approaches, at stream angles of approximately 80 0 from the normal, dimensions roughly once or twice the average wavelength of visible light. Such films may have application in solar energy collector systems because of the high absorptivity of sunlight shown by such films. Mechanisms which describe the tendency for crystallite spacing to increase with increasing angle are discussed. (Auth.)

Deposition and characterization of ZnS/Si heterojunctions produced by vacuum evaporation

Science.gov (United States)

Landis, Geoffrey A.; Loferski, Joseph J.; Beaulieu, Roland

1988-01-01

Isotype heterojunctions of ZnS (lattice constant 5.41 A) were grown on silicon (lattice constant 5.43 A) p-n junctions to form a minority-carrier mirror. The deposition process was vacuum evaporation from a ZnS powder source onto a heated (450 C) substrate. Both planar (100) and textured (111) surfaces were used. A reduction of the minority-carrier recombination at the surface was seen from increased short-wavelength quantum response and increased illuminated open-circuit voltage. The minority-carrier diffusion length was not degraded by the process.

Surface Effects and Challenges for Application of Piezoelectric Langasite Substrates in Surface Acoustic Wave Devices Caused by High Temperature Annealing under High Vacuum.

Science.gov (United States)

Seifert, Marietta; Rane, Gayatri K; Kirbus, Benjamin; Menzel, Siegfried B; Gemming, Thomas

2015-12-19

Substrate materials that are high-temperature stable are essential for sensor devices which are applied at high temperatures. Although langasite is suggested as such a material, severe O and Ga diffusion into an O-affine deposited film was observed during annealing at high temperatures under vacuum conditions, leading to a damage of the metallization as well as a change of the properties of the substrate and finally to a failure of the device. Therefore, annealing of bare LGS (La 3 Ga 5 SiO 14 ) substrates at 800 ∘ C under high vacuum conditions is performed to analyze whether this pretreatment improves the suitability and stability of this material for high temperature applications in vacuum. To reveal the influence of the pretreatment on the subsequently deposited metallization, RuAl thin films are used as they are known to oxidize on LGS at high temperatures. A local study of the pretreated and metallized substrates using transmission electron microscopy reveals strong modification of the substrate surface. Micro cracks are visible. The composition of the substrate is strongly altered at those regions. Severe challenges for the application of LGS substrates under high-temperature vacuum conditions arise from these substrate damages, revealing that the pretreatment does not improve the applicability.

Surface Effects and Challenges for Application of Piezoelectric Langasite Substrates in Surface Acoustic Wave Devices Caused by High Temperature Annealing under High Vacuum

Directory of Open Access Journals (Sweden)

Marietta Seifert

2015-12-01

Full Text Available Substrate materials that are high-temperature stable are essential for sensor devices which are applied at high temperatures. Although langasite is suggested as such a material, severe O and Ga diffusion into an O-affine deposited film was observed during annealing at high temperatures under vacuum conditions, leading to a damage of the metallization as well as a change of the properties of the substrate and finally to a failure of the device. Therefore, annealing of bare LGS (La 3 Ga 5 SiO 14 substrates at 800 ∘ C under high vacuum conditions is performed to analyze whether this pretreatment improves the suitability and stability of this material for high temperature applications in vacuum. To reveal the influence of the pretreatment on the subsequently deposited metallization, RuAl thin films are used as they are known to oxidize on LGS at high temperatures. A local study of the pretreated and metallized substrates using transmission electron microscopy reveals strong modification of the substrate surface. Micro cracks are visible. The composition of the substrate is strongly altered at those regions. Severe challenges for the application of LGS substrates under high-temperature vacuum conditions arise from these substrate damages, revealing that the pretreatment does not improve the applicability.

Deposition of mullite and mullite-like coatings on silicon carbide by dual-source metal plasma immersion. Topical report, October 1995--September 1996

Energy Technology Data Exchange (ETDEWEB)

Brown, I.G.; Monteiro, O.R. [Lawrence Berkeley National Lab., CA (United States)

1997-04-01

Mullite and mullite-like coatings on silicon carbide have been produced by a Metal Plasma Immersion Ion Implantation and Deposition (Mepiiid) technique based on two cathodic vacuum arc sources and concurrent pulse biasing of the substrate in an oxygen atmosphere. The deposition was carried out at oxygen partial pressures of between 0.66 and 3.33 Pa. The Al:Si ratio in the films varied from 1:1 to 8:1 and was controlled by varying the pulse duration of the separate plasma guns. High bias voltage was used early in the deposition process in order to produce atomic mixing at the film-substrate interface, while lower bias voltage was used later in the deposition; low ion energy allows control of the physical properties of the film as well as faster deposition rates. The as-deposited films were amorphous, and crystalline mullite was formed by subsequent annealing at 1,100 C for 2 hours in air. Strong adhesion between the mullite and the SiC was achieved, in some cases exceeding the 70 MPa instrumental limit of the pull-tester.

Effect of metal surface composition on deposition behavior of stainless steel component dissolved in liquid sodium

International Nuclear Information System (INIS)

Yokota, Norikatsu; Shimoyashiki, Shigehiro

1988-01-01

Deposition behavior of corrosion products has been investigated to clarify the effect of metal surface composition on the deposition process in liquid sodium. For the study a sodium loop made of Type 304 stainless steel was employed. Deposition test pieces, which were Type 304 stainless steel, iron, nickel or Inconel 718, were immersed in the sodium pool of the test pot. Corrosion test pieces, which were Type 304 stainless steel, 50 at% Fe-50 at%Mn and Inconel 718, were set in a heater pin assembly along the axial direction of the heater pin surface. Sodium temperatures at the outlet and inlet of the heater pin assembly were controlled at 943 and 833 K, respectively. Sodium was purified at a cold trap temperature of 393 K and the deposition test was carried out for 4.3 x 10 2 - 2.9 x 10 4 ks. Several crystallized particles were observed on the surface of the deposition test pieces. The particles had compositions and crystal structures which depended on both the composition of deposition test pieces and the concentration of iron and manganese in sodium. Only iron-rich particles having a polyhedral shape deposited on the iron surface. Two types of particles, iron-rich α-phase and γ-phase with nearly the same composition as stainless steel, were deposited on Type 304 stainless steel. A Ni-Mn alloy was deposited on the nickel surface in the case of a higher concentration of manganese in sodium. On the other hand, for a lower manganese concentration, a Fe-Ni alloy was precipitated on the nickel surface. Particles deposited on nickel had a γ-phase crystal structure similar to the deposition test piece of nickel. Hence, the deposition process can be explained as follows: Corrosion products in liquid sodium were deposited on the metal surface by forming a metal alloy selectively with elements of the metal surface. (author)

Microstructure, Residual Stress, Corrosion and Wear Resistance of Vacuum Annealed TiCN/TiN/Ti Films Deposited on AZ31

Directory of Open Access Journals (Sweden)

Haitao Li

2016-12-01

Full Text Available Composite titanium carbonitride (TiCN thin films deposited on AZ31 by DC/RF magnetron sputtering were vacuum annealed at different temperatures. Vacuum annealing yields the following on the structure and properties of the films: the grain grows and the roughness increases with an increase of annealing temperature, the structure changes from polycrystalline to single crystal, and the distribution of each element becomes more uniform. The residual stress effectively decreases compared to the as-deposited film, and their corrosion resistance is much improved owing to the change of structure and fusion of surface defects, whereas the wear-resistance is degraded due to the grain growth and the increase of surface roughness under a certain temperature.

Dry deposition fluxes and deposition velocities of trace metals in the Tokyo metropolitan area measured with a water surface sampler.

Science.gov (United States)

Sakata, Masahiro; Marumoto, Kohji

2004-04-01

Dry deposition fluxes and deposition velocities (=deposition flux/atmospheric concentration) for trace metals including Hg, Cd, Cu, Mn, Pb, and Zn in the Tokyo metropolitan area were measured using an improved water surface sampler. Mercury is deposited on the water surface in both gaseous (reactive gaseous mercury, RGM) and particulate (particulate mercury, Hg(p)) forms. The results based on 1 yr observations found that dry deposition plays a significant if not dominant role in trace metal deposition in this urban area, contributing fluxes ranging from 0.46 (Cd) to 3.0 (Zn) times those of concurrent wet deposition fluxes. The deposition velocities were found to be dependent on the deposition of coarse particles larger than approximately 5 microm in diameter on the basis of model calculations. Our analysis suggests that the 84.13% diameter is a more appropriate index for each deposited metal than the 50% diameter in the assumed undersize log-normal distribution, because larger particles are responsible for the flux. The deposition velocities for trace metals other than mercury increased exponentially with an increase in their 84.13% diameters. Using this regression equation, the deposition velocities for Hg(p) were estimated from its 84.13% diameter. The deposition fluxes for Hg(p) calculated from the estimated velocities tended to be close to the mercury fluxes measured with the water surface sampler during the study periods except during summer.

Some novel design features of the LBL metal vapor vacuum arc ion sources

International Nuclear Information System (INIS)

MacGill, R.A.; Brown, I.G.; Galvin, J.E.

1990-01-01

The family of MEVVA (metal vapor vacuum arc) high current metal ion sources developed at LBL over the past several years has grown to include a number of different source versions with a wide range of some of the design and operational parameters. The MicroMEVVA source is a particularly compact version, about 2 cm diam and 10 cm long, while the MEVVA IV weighs some 30 kG. MEVVAs IV and V incorporate multiple cathode assemblies (16 and 18 separate cathodes, respectively), and the operating cathode can be switched rapidly and without downtime. The new MEVVA V embodiment is quite compact considering its broad beam (10 cm), high voltage (100 kV), and multiple cathode features. The large-area extractor grids used in MEVVA V were fabricated using a particularly simple technique, and they are clamped into position and can thus be changed simply and quickly. The electrical system used to drive the arc is particularly simple and incorporates several attractive features. In this article we review and describe a number of the mechanical and electrical design features that have been developed for these sources

An alternative non-vacuum and low cost ESAVD method for the deposition of Cu(In,Ga)Se{sub 2} absorber layers

Energy Technology Data Exchange (ETDEWEB)

Wang, Mingqing; Liu, Junpeng; Choy, KwangLeong [UCL Centre for Materials Discovery, University College London (United Kingdom); Hou, Xianghui [Faculty of Engineering, University of Nottingham (United Kingdom); Gibson, Paul [IMPT Ltd, Nottingham (United Kingdom); Salem, Elhamali; Koutsogeorgis, Demosthenes; Cranton, Wayne [School of Science and Technology, Nottingham Trent University (United Kingdom)

2015-01-01

In this article, an environmentally friendly and non-vacuum electrostatic spray assisted vapor deposition (ESAVD) process has been developed as an alternative and low cost method to deposit CIGS absorber layers. ESAVD is a non-vacuum chemical vapor deposition based process whereby a mixture of chemical precursors is atomized to form aerosol. The aerosol is charged and directed towards a heated substrate where it would undergo decomposition and chemical reaction to deposit a stable solid film onto the substrate. A sol containing copper, indium, and gallium salts, as well as thiourea was formulated into a homogeneous chemical precursor mixture for the deposition of CIGS films. After selenization, both XRD and Raman results show the presence of the characteristic peaks of CIGSSe in the fabricated thin films. From SEM images and XRF results, it can be seen that the deposited absorbers are promising for good performance solar cells. The fabricated solar cell with a typical structure of glass/Mo/CIGSSe/CdS/i-ZnO/ITO shows efficiency of 2.82% under 100 mW cm{sup -2} AM1.5 illumination. (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

Changes in the structural and electrical properties of vacuum post-annealed tungsten- and titanium-doped indium oxide films deposited by radio frequency magnetron sputtering

NARCIS (Netherlands)

Yan, L.T.; Schropp, R.E.I.

2011-01-01

Tungsten- and titanium-doped indium oxide (IWO and ITiO) filmswere deposited at room temperature by radio frequency (RF) magnetron sputtering, and vacuum post-annealing was used to improve the electron mobility. With increasing deposition power, the as deposited films showed an increasingly

Developments in hot-filament metal oxide deposition (HFMOD)

International Nuclear Information System (INIS)

Durrant, Steven F.; Trasferetti, Benedito C.; Scarminio, Jair; Davanzo, Celso U.; Rouxinol, Francisco P.M.; Gelamo, Rogerio V.; Bica de Moraes, Mario A.

2008-01-01

Hot-filament metal oxide deposition (HFMOD) is a variant of conventional hot-filament chemical vapor deposition (HFCVD) recently developed in our laboratory and successfully used to obtain high-quality, uniform films of MO x , WO x and VO x . The method employs the controlled oxidation of a filament of a transition metal heated to 1000 deg. C or more in a rarefied oxygen atmosphere (typically, of about 1 Pa). Metal oxide vapor formed on the surface of the filament is transported a few centimetres to deposit on a suitable substrate. Key system parameters include the choice of filament material and diameter, the applied current and the partial pressures of oxygen in the chamber. Relatively high film deposition rates, such as 31 nm min -1 for MoO x , are obtained. The film stoichiometry depends on the exact deposition conditions. MoO x films, for example, present a mixture of MoO 2 and MoO 3 phases, as revealed by XPS. As determined by Li + intercalation using an electrochemical cell, these films also show a colouration efficiency of 19.5 cm 2 C -1 at a wavelength of 700 nm. MO x and WO x films are promising in applications involving electrochromism and characteristics of their colouring/bleaching cycles are presented. The chemical composition and structure of VO x films examined using IRRAS (infrared reflection-absorption spectroscopy), RBS (Rutherford backscattering spectrometry) and XPS (X-ray photoelectron spectrometry) are also presented

Consolidation of simulated nuclear metallic waste by vacuum coreless induction melting

International Nuclear Information System (INIS)

Montgomery, D.R.

1984-10-01

Vacuum coreless induction melting with bottom pouring has exceeded expectations for simplicity, reliability, and versatility when melting the zirconium and iron eutectic alloy. The melting tests have established that: the eutectic mixture of oxidized Zircaloy 4 hulls mixed with Type 316 stainless steel hulls can be melted at 41 kg/h at 40 kW with a power consumption of 1.03 kWh/kg and a melting temperature of 1260 0 C; the life of a graphite crucible can be expected to be longer by a factor of 4 than was previously projected; the bottom-pour water-cooled copper freeze plug was 100% reliable; a 24-in.-tall stainless steel canister with 1/4-in.-thick walls (6-in. inside diameter) was satisfactory in every respect; an ingot formed from 4 consecutive heats poured into a stainless steel canister appeared to be approx. 99% dense after sectioning; preplaced scrap in the canister can be encapsulated with molten metal to about 99% density; large pieces of Zircaloy 4 and stainless steel scrap can be melted, but have differing melting parameters; the pouring nozzle requires further development to prevent solidified drops from forming at the hole exit after a pour. It is recommended that a large-scale cold mock-up facility be established to refine and test a full-scale vacuum coreless induction melting system. Other options might include further scaled-down experiments to test other alloys and crucible materials under different atmospheric conditions (i.e., air melting). 1 reference, 18 figures, 1 table

Adsorption of heavy metals by road deposited solids.

Science.gov (United States)

Gunawardana, Chandima; Goonetilleke, Ashantha; Egodawatta, Prasanna

2013-01-01

The research study discussed in the paper investigated the adsorption/desorption behaviour of heavy metals commonly deposited on urban road surfaces, namely, Zn, Cu, Cr and Pb, for different particle size ranges of solids. The study outcomes, based on field studies and batch experiments, confirmed that road deposited solids particles contain a significantly high amount of vacant charge sites with the potential to adsorb additional heavy metals. Kinetic studies and adsorption experiments indicated that Cr is the most preferred metal element to associate with solids due to the relatively high electronegativity and high charge density of trivalent cation (Cr(3+)). However, the relatively low availability of Cr in the urban road environment could influence this behaviour. Comparing total adsorbed metals present in solids particles, it was found that Zn has the highest capacity for adsorption to solids. Desorption experiments confirmed that a low concentration of Cu, Cr and Pb in solids was present in water-soluble and exchangeable form, whilst a significant fraction of adsorbed Zn has a high likelihood of being released back into solution. Among heavy metals, Zn is considered to be the most commonly available metal among road surface pollutants.

The effect of grooves in amorphous substrates on the orientation of metal deposits. I - Carbon substrates

Science.gov (United States)

Anton, R.; Poppa, H.; Flanders, D. C.

1982-01-01

The graphoepitaxial alignment of vapor-deposited discrete metal crystallites is investigated in the nucleation and growth stages and during annealing by in situ UHV/TEM techniques. Various stages of nucleation, growth and coalescence of vapor deposits of Au, Ag, Pb, Sn, and Bi on amorphous, topographically structured C substrates are analyzed by advanced dark-field techniques to detect preferred local orientations. It is found that the topography-induced orientation of metal crystallites depends strongly on their mobility and their respective tendency to develop pronounced crystallographic shapes. Lowering of the average surface free energies and increasing the crystallographic surface energy anisotropies cause generally improved graphoepitaxial alignments.

Heavy metals in atmospheric surrogate dry deposition

Science.gov (United States)

Morselli; Cecchini; Grandi; Iannuccilli; Barilli; Olivieri

1999-02-01

This paper describes a methodological approach for the assessment of the amount of surrogate dry deposition of several toxic heavy metals (Cd, Cr, Cu, Ni, Pb, V, Zn) associated with atmospheric particulate matter at ground level. The objectives of the study were twofold: i) the evaluation of several techniques for the digestion of dry deposition samples for trace metal analysis; ii) the comparison of the results from two samplers with different collecting surfaces. A dry solid surface sampler (DRY sampler, Andersen--USA) and a water layer surface sampler (DAS sampler--MTX Italy) were employed. The samples were collected over a one-year period in an urban site of Bologna (northern Italy). A description is given of the complete procedure, from sampling to data elaboration, including sample storage, digestion and analytical methods. According to the results obtained with three different digestion techniques (Teflon bomb, microwave digester and Teflon flask with vapour cooling system), the highest recovery rate was achieved by the Teflon bomb procedure employing an NBS 1648 Standard Reference Material; 90-95% of the elements considered were recovered by dissolution in a pressurized Teflon bomb with an HNO3-HF mixture. Given these results, the technique was adopted for dry deposition sample digestion. On the basis of the amount of heavy metals measured as monthly deposition fluxes (microg/m2), the collecting efficiency of the DAS sampler for a number of elements was found to be as much as two to three times greater than that of the DRY sampler.

X-ray photoelectron spectroscopy of nano-multilayered Zr-O/Al-O coatings deposited by cathodic vacuum arc plasma

International Nuclear Information System (INIS)

Zhitomirsky, V.N.; Kim, S.K.; Burstein, L.; Boxman, R.L.

2010-01-01

Nano-multilayered Zr-O/Al-O coatings with alternating Zr-O and Al-O layers having a bi-layer period of 6-7 nm and total coating thickness of 1.0-1.2 μm were deposited using a cathodic vacuum arc plasma process on rotating Si substrates. Plasmas generated from two cathodes, Zr and Al, were deposited simultaneously in a mixture of Ar and O 2 background gases. The Zr-O/Al-O coatings, as well as bulk ZrO 2 and Al 2 O 3 reference samples, were studied using X-ray photoelectron spectroscopy (XPS). The XPS spectra were analyzed on the surface and after sputtering with a 4 kV Ar + ion gun. High resolution angle resolved spectra were obtained at three take-off angles: 15 o , 45 o and 75 o relative to the sample surface. It was shown that preferential sputtering of oxygen took place during XPS of bulk reference ZrO 2 samples, producing ZrO and free Zr along with ZrO 2 in the XPS spectra. In contrast, no preferential sputtering was observed with Al 2 O 3 reference samples. The Zr-O/Al-O coatings contained a large amount of free metals along with their oxides. Free Zr and Al were observed in the coating spectra both before and after sputtering, and thus cannot be due solely to preferential sputtering. Transmission electron microscopy revealed that the Zr-O/Al-O coatings had a nano-multilayered structure with well distinguished alternating layers. However, both of the alternating layers of the coating contained of a mixture of aluminum and zirconium oxides and free Al and Zr metals. The concentration of Zr and Al changed periodically with distance normal to the coating surface: the Zr maximum coincided with the Al minimum and vice versa. However the concentration of Zr in both alternating layers was significantly larger than that of Al. Despite the large free metal concentration, the Knoop hardness, 21.5 GPa, was relatively high, which might be attributed to super-lattice formation or formation of a metal-oxide nanocomposite within the layers.

Laser Direct Metal Deposition of 2024 Al Alloy: Trace Geometry Prediction via Machine Learning

Directory of Open Access Journals (Sweden)

Fabrizia Caiazzo

2018-03-01

Full Text Available Laser direct metal deposition is an advanced additive manufacturing technology suitably applicable in maintenance, repair, and overhaul of high-cost products, allowing for minimal distortion of the workpiece, reduced heat affected zones, and superior surface quality. Special interest is growing for the repair and coating of 2024 aluminum alloy parts, extensively utilized for a wide range of applications in the automotive, military, and aerospace sectors due to its excellent plasticity, corrosion resistance, electric conductivity, and strength-to-weight ratio. A critical issue in the laser direct metal deposition process is related to the geometrical parameters of the cross-section of the deposited metal trace that should be controlled to meet the part specifications. In this research, a machine learning approach based on artificial neural networks is developed to find the correlation between the laser metal deposition process parameters and the output geometrical parameters of the deposited metal trace produced by laser direct metal deposition on 5-mm-thick 2024 aluminum alloy plates. The results show that the neural network-based machine learning paradigm is able to accurately estimate the appropriate process parameters required to obtain a specified geometry for the deposited metal trace.

Laser Direct Metal Deposition of 2024 Al Alloy: Trace Geometry Prediction via Machine Learning.

Science.gov (United States)

Caiazzo, Fabrizia; Caggiano, Alessandra

2018-03-19

Laser direct metal deposition is an advanced additive manufacturing technology suitably applicable in maintenance, repair, and overhaul of high-cost products, allowing for minimal distortion of the workpiece, reduced heat affected zones, and superior surface quality. Special interest is growing for the repair and coating of 2024 aluminum alloy parts, extensively utilized for a wide range of applications in the automotive, military, and aerospace sectors due to its excellent plasticity, corrosion resistance, electric conductivity, and strength-to-weight ratio. A critical issue in the laser direct metal deposition process is related to the geometrical parameters of the cross-section of the deposited metal trace that should be controlled to meet the part specifications. In this research, a machine learning approach based on artificial neural networks is developed to find the correlation between the laser metal deposition process parameters and the output geometrical parameters of the deposited metal trace produced by laser direct metal deposition on 5-mm-thick 2024 aluminum alloy plates. The results show that the neural network-based machine learning paradigm is able to accurately estimate the appropriate process parameters required to obtain a specified geometry for the deposited metal trace.

Electromagnetic forces on a metallic Tokamak vacuum vessel following a disruptive instability

International Nuclear Information System (INIS)

Eckhartt, D.

1979-04-01

During a 'hard' disruptive instability of a Tokamak plasma the current-carrying plasma is lost within a very short time, typically few milliseconds. If the plasma is contained in a metallic vacuum vessel, electric currents are set up in the vessel following the disappearance of the plasma current. These vessel currents together with the magnetic fields intersecting the vessel generate electromagnetic forces which appear as mechanical loads on the vessel. In the following note it is assumed that the vacuum vessel is surrounded by an 'outer equivalent' or 'flux-conserving' shell having a characteristic time of magnetic field penetration which is long compared to the time of existence of the vessel currents. This property defines the distribution of vessel current densities (and hence the load distribution) without referring to the exact mechanism or time sequence of events by which the plasma current is lost. Numerical examples of the electromagnetic force distribution from this model refer to parameters of the JET-device with the simplifying assumption of circular cross-sections for plasma current, vacuum vessel, and outer equivalent shell. (orig.)

Atomic-layer-deposited WNxCy thin films as diffusion barrier for copper metallization

Science.gov (United States)

Kim, Soo-Hyun; Oh, Su Suk; Kim, Ki-Bum; Kang, Dae-Hwan; Li, Wei-Min; Haukka, Suvi; Tuominen, Marko

2003-06-01

The properties of WNxCy films deposited by atomic layer deposition (ALD) using WF6, NH3, and triethyl boron as source gases were characterized as a diffusion barrier for copper metallization. It is noted that the as-deposited film shows an extremely low resistivity of about 350 μΩ cm with a film density of 15.37 g/cm3. The film composition measured from Rutherford backscattering spectrometry shows W, C, and N of ˜48, 32, and 20 at. %, respectively. Transmission electron microscopy analyses show that the as-deposited film is composed of face-centered-cubic phase with a lattice parameter similar to both β-WC1-x and β-W2N with an equiaxed microstructure. The barrier property of this ALD-WNxCy film at a nominal thickness of 12 nm deposited between Cu and Si fails only after annealing at 700 °C for 30 min.

Using ballistic electron emission microscopy to investigate the metal-vacuum interface

International Nuclear Information System (INIS)

Baykul, M.C.

1993-01-01

This dissertation investigates the possibility of using the ballistic electron microscope (BEEM) to study the metal-vacuum interface. In order to do that, we have designed and built a novel experimental setup which consists of an STM tip from which electrons tunnel into a thin (<60 nm), free-standing metal film in vacuum ambient. When the tunnel bias exceeds the work function of the metal, some small fraction of the tunneling electrons traverses through the film without any energy loss, and emits into the vacuum through the back side of the film. The rate of emission of such ballistic electrons, which is called the collector current, is measured by a channel electron multiplier. One of the major challenges for this investigation was preparing free-standing thin films by the following steps: (a) evaporating Au onto a (100) face of NaCl at room temperature, (b) dissolving the NaCl in a 50-50 mixture of ethyl alcohol and distilled water, and (c) catching the Au film that floats on the surface of the solvent onto a Cu grid. Subsequent annealing increased the grain size, and improved the bonding of the film onto the grid. We have succeeded in observing ballistic electron emission through these free-standing thin films, even though the collector current tended to decay in a time interval of a few tenths of a second. The exact cause of this decay is not known, however we have suggested some possibilities. By ramping the bias voltage from about 0.2 V to about 10.5 V, we find the threshold bias voltage at which the collector current begins. This threshold voltage is an upper limit for the work function of AU. From our data we obtained a value of 5.2 V for this upper limit. We also have plotted the collector current, that was averaged over a scan area of 375 nm x 375 nm, against the tunnel bias. This plot shows that, for this region, the lowest threshold bias voltage for ballistic electron emission is between 3.5 V and 4.5 V

Observation of self-sputtering in energetic condensation of metal ions

International Nuclear Information System (INIS)

Anders, Andre

2004-01-01

The condensation of energetic metal ions on a surface may cause self-sputtering even in the absence of substrate bias. Charge-state-averaged self-sputtering yields were determined for both zirconium and gold ions generated by a cathodic vacuum arc. Films were deposited on differently biased substrates exposed to streaming Zr and Au vacuum arc plasma. The self-sputtering yields for both metals were estimated to be about 0.05 in the absence of bias, and exceeding 0.5 when bias reached-50 V. These surprisingly high values can be reconciled with binary collision theory and molecular dynamics calculations taking high the kinetic and potential energy of vacuum arc ions into account

Formation of amorphous metal alloys by chemical vapor deposition

Science.gov (United States)

Mullendore, A.W.

1988-03-18

Amorphous alloys are deposited by a process of thermal dissociation of mixtures of organometallic compounds and metalloid hydrides,e.g., transition metal carbonyl, such as nickel carbonyl and diborane. Various sizes and shapes of deposits can be achieved, including near-net-shape free standing articles, multilayer deposits, and the like. Manipulation or absence of a magnetic field affects the nature and the structure of the deposit. 1 fig.

Investigations Of A Pulsed Cathodic Vacuum Arc

Science.gov (United States)

Oates, T. W. H.; Pigott, J.; Denniss, P.; Mckenzie, D. R.; Bilek, M. M. M.

2003-06-01

Cathodic vacuum arcs are well established as a method for producing thin films for coatings and as a source of metal ions. Research into DC vacuum arcs has been going on for over ten years in the School of Physics at the University of Sydney. Recently a project was undertaken in the school to design and build a pulsed CVA for use in the investigation of plasma sheaths and plasma immersion ion implantation. Pulsed cathodic vacuum arcs generally have a higher current and plasma density and also provide a more stable and reproducible plasma density than their DC counterparts. Additionally it has been shown that if a high repetition frequency can be established the deposition rate of pulsed arcs is equal to or greater than that of DC arcs with a concomitant reduction in the rate of macro-particle formation. We present here results of our investigations into the building of a center-triggered pulsed cathodic vacuum arc. The design of the power supply and trigger mechanism and the geometry of the anode and cathode are examined. Observations of type I and II arc spots using a CCD camera, and cathode spot velocity dependence on arc current will be presented. The role of retrograde motion in a high current pulsed arc is discussed.

Investigations Of A Pulsed Cathodic Vacuum Arc

International Nuclear Information System (INIS)

Oates, T.W.H.; Pigott, J.; Denniss, P.; Mckenzie, D.R.; Bilek, M.M.M.

2003-01-01

Cathodic vacuum arcs are well established as a method for producing thin films for coatings and as a source of metal ions. Research into DC vacuum arcs has been going on for over ten years in the School of Physics at the University of Sydney. Recently a project was undertaken in the school to design and build a pulsed CVA for use in the investigation of plasma sheaths and plasma immersion ion implantation. Pulsed cathodic vacuum arcs generally have a higher current and plasma density and also provide a more stable and reproducible plasma density than their DC counterparts. Additionally it has been shown that if a high repetition frequency can be established the deposition rate of pulsed arcs is equal to or greater than that of DC arcs with a concomitant reduction in the rate of macro-particle formation. We present here results of our investigations into the building of a center-triggered pulsed cathodic vacuum arc. The design of the power supply and trigger mechanism and the geometry of the anode and cathode are examined. Observations of type I and II arc spots using a CCD camera, and cathode spot velocity dependence on arc current will be presented. The role of retrograde motion in a high current pulsed arc is discussed

Developments in hot-filament metal oxide deposition (HFMOD)

Energy Technology Data Exchange (ETDEWEB)

Durrant, Steven F. [Laboratorio de Plasmas Tecnologicos, Campus Experimental de Sorocaba, Universidade Estadual Paulista (UNESP), Avenida Tres de Marco, 511, Alto de Boa Vista, 18087-180 Sorocaba, SP (Brazil)], E-mail: steve@sorocaba.unesp.br; Trasferetti, Benedito C. [Departamento de Policia Federal, Superintendencia Regional no Piaui, Setor Tecnico-Cientifico, Avenida Maranhao, 1022/N, 64.000-010, Teresina, PI (Brazil); Scarminio, Jair [Departamento de Fisica, Universidade Estadual de Londrina (UEL), 86051-990, Londrina, PR (Brazil); Davanzo, Celso U. [Instituto de Quimica, Universidade Estadual de Campinas (UNICAMP), 13083-970, Campinas, SP (Brazil); Rouxinol, Francisco P.M.; Gelamo, Rogerio V.; Bica de Moraes, Mario A. [Laboratorio de Processos de Plasma, Departamento de Fisica Aplicada, Instituto de Fisica Gleb Wataghin, Universidade Estadual de Campinas (UNICAMP), 13083-970, Campinas, SP (Brazil)

2008-01-15

Hot-filament metal oxide deposition (HFMOD) is a variant of conventional hot-filament chemical vapor deposition (HFCVD) recently developed in our laboratory and successfully used to obtain high-quality, uniform films of MO{sub x}, WO{sub x} and VO{sub x}. The method employs the controlled oxidation of a filament of a transition metal heated to 1000 deg. C or more in a rarefied oxygen atmosphere (typically, of about 1 Pa). Metal oxide vapor formed on the surface of the filament is transported a few centimetres to deposit on a suitable substrate. Key system parameters include the choice of filament material and diameter, the applied current and the partial pressures of oxygen in the chamber. Relatively high film deposition rates, such as 31 nm min{sup -1} for MoO{sub x}, are obtained. The film stoichiometry depends on the exact deposition conditions. MoO{sub x} films, for example, present a mixture of MoO{sub 2} and MoO{sub 3} phases, as revealed by XPS. As determined by Li{sup +} intercalation using an electrochemical cell, these films also show a colouration efficiency of 19.5 cm{sup 2} C{sup -1} at a wavelength of 700 nm. MO{sub x} and WO{sub x} films are promising in applications involving electrochromism and characteristics of their colouring/bleaching cycles are presented. The chemical composition and structure of VO{sub x} films examined using IRRAS (infrared reflection-absorption spectroscopy), RBS (Rutherford backscattering spectrometry) and XPS (X-ray photoelectron spectrometry) are also presented.

Numerical Simulations of Particle Deposition in Metal Foam Heat Exchangers

Science.gov (United States)

Sauret, Emilie; Saha, Suvash C.; Gu, Yuantong

2013-01-01

Australia is a high-potential country for geothermal power with reserves currently estimated in the tens of millions of petajoules, enough to power the nation for at least 1000 years at current usage. However, these resources are mainly located in isolated arid regions where water is scarce. Therefore, wet cooling systems for geothermal plants in Australia are the least attractive solution and thus air-cooled heat exchangers are preferred. In order to increase the efficiency of such heat exchangers, metal foams have been used. One issue raised by this solution is the fouling caused by dust deposition. In this case, the heat transfer characteristics of the metal foam heat exchanger can dramatically deteriorate. Exploring the particle deposition property in the metal foam exchanger becomes crucial. This paper is a numerical investigation aimed to address this issue. Two-dimensional (2D) numerical simulations of a standard one-row tube bundle wrapped with metal foam in cross-flow are performed and highlight preferential particle deposition areas.

Tetrasilane and digermane for the ultra-high vacuum chemical vapor deposition of SiGe alloys

International Nuclear Information System (INIS)

Hart, John; Hazbun, Ramsey; Eldridge, David; Hickey, Ryan; Fernando, Nalin; Adam, Thomas; Zollner, Stefan; Kolodzey, James

2016-01-01

Tetrasilane and digermane were used to grow epitaxial silicon germanium layers on silicon substrates in a commercial ultra-high vacuum chemical vapor deposition tool. Films with concentrations up to 19% germanium were grown at temperatures from 400 °C to 550 °C. For all alloy compositions, the growth rates were much higher compared to using mono-silane and mono-germane. The quality of the material was assessed using X-ray diffraction, atomic force microscopy, and spectroscopic ellipsometry; all indicating high quality epitaxial films with low surface roughness suitable for commercial applications. Studies of the decomposition kinetics with regard to temperature were performed, revealing an unusual growth rate maximum between the high and low temperature deposition regimes. - Highlights: • Higher order precursors tetrasilane and digermane • Low temperature deposition • Thorough film characterization with temperature • Arrhenius growth rate peak

Ion spectra of the metal vapor vacuum arc ion source with compound and alloy cathodes

Science.gov (United States)

Sasaki, Jun; Brown, Ian G.

1990-01-01

In metal vapor vacuum arc (MEVVA) ion sources, vacuum arc plasma with cathodes of single, pure elements has been utilized for the production of metal ions. In this study, we have investigated the charge state distributions of ions produced in vacuum arc plasmas in a MEVVA ion source for the case when the cathode is an alloy or a compound material. The ion charge state spectra were analyzed by means of a time-of-flight apparatus. We have compared the ion spectra for a cathode of an alloy or a compound material with its constituent elements: TiC/TiN/TiO2/Ti/C, SiC/Si/C, WC/W/C U/UN/(UN-ZrC)/Zr/C, and brass/Zn/Cu. We find that the MEVVA produces ions of all constituent elements in the compound and the alloy cathodes. The charge state distribution of each element differs, however, from the charge state distribution obtained in the vacuum arc with a cathode made of the pure, single constituent element. Fractional values of the total ion numbers of each constituent element in the extracted beam depart from the stoichiometry of the elements in the cathode material. In an operation with a TiC cathode, we irradiated a 304 stainless-steel plate with the extracted beam. Results from glow-discharge spectroscopy (GDS) of the surface show that both titanium and carbon are implanted in the substrate after the irradiation.

Spectroscopic monitoring of metallic bonding in laser metal deposition

NARCIS (Netherlands)

Ya, Wei; Konuk, A.R.; Aarts, Ronald G.K.M.; Pathiraj, B.; Huis in 't Veld, Bert

2015-01-01

A new approach is presented in this paper to link optical emission spectrum analysis to the quality of clad layers produced with laser metal deposition (LMD). A Nd:YAG laser (λ = 1.064 μm) was used to produce clad tracks with Metco 42C powder on AISI 4140 steel substrate. The laser power was ramped

Method for sequentially processing a multi-level interconnect circuit in a vacuum chamber

Science.gov (United States)

Routh, D. E.; Sharma, G. C. (Inventor)

1984-01-01

An apparatus is disclosed which includes a vacuum system having a vacuum chamber in which wafers are processed on rotating turntables. The vacuum chamber is provided with an RF sputtering system and a dc magnetron sputtering system. A gas inlet introduces various gases to the vacuum chamber and creates various gas plasma during the sputtering steps. The rotating turntables insure that the respective wafers are present under the sputtering guns for an average amount of time such that consistency in sputtering and deposition is achieved. By continuous and sequential processing of the wafers in a common vacuum chamber without removal, the adverse affects of exposure to atmospheric conditions are eliminated providing higher quality circuit contacts and functional device.

Constructive and destructive quantum interference sensitive to quantum vacuum mode structure in a metallic waveguide

International Nuclear Information System (INIS)

Shen Jianqi

2011-01-01

Quantum vacuum mode structure can be changed due to length scale fluctuation of the cross section of a metallic waveguide. Such a structure change in vacuum modes (particularly in cutoff vacuum modes) would lead to dramatic enhancement or inhibition of spontaneous emission decay of atoms and, if the waveguide is filled with a dilute atomic vapor consisting of quantum-coherent atoms of a four-level tripod-configuration system, an optical wave propagating inside the waveguide can be coherently manipulated by tunable constructive and destructive quantum interference between two control transitions (driven by two control fields) in a quite unusual way (e.g., the optical response, in which a three-level dark state is involved, is sensitive to the waveguide dimension variations at certain positions of resonance of the atomic spontaneous emission decay rate). Therefore, an intriguing effect that can be employed to designs of new photonic and quantum optical devices could be achieved based on the present mechanisms of quantum-vacuum manipulation and quantum coherence control.

Molecular-beam-deposited yttrium-oxide dielectrics in aluminum-gated metal - oxide - semiconductor field-effect transistors: Effective electron mobility

International Nuclear Information System (INIS)

Ragnarsson, L.-A degree.; Guha, S.; Copel, M.; Cartier, E.; Bojarczuk, N. A.; Karasinski, J.

2001-01-01

We report on high effective mobilities in yttrium-oxide-based n-channel metal - oxide - semiconductor field-effect transistors (MOSFETs) with aluminum gates. The yttrium oxide was grown in ultrahigh vacuum using a reactive atomic-beam-deposition system. Medium-energy ion-scattering studies indicate an oxide with an approximate composition of Y 2 O 3 on top of a thin layer of interfacial SiO 2 . The thickness of this interfacial oxide as well as the effective mobility are found to be dependent on the postgrowth anneal conditions. Optimum conditions result in mobilities approaching that of SiO 2 -based MOSFETs at higher fields with peak mobilities at approximately 210 cm 2 /Vs. [copyright] 2001 American Institute of Physics

Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition

Directory of Open Access Journals (Sweden)

Golnaz Karbasian

2017-03-01

Full Text Available Single electron transistors are nanoscale electron devices that require thin, high-quality tunnel barriers to operate and have potential applications in sensing, metrology and beyond-CMOS computing schemes. Given that atomic layer deposition is used to form CMOS gate stacks with low trap densities and excellent thickness control, it is well-suited as a technique to form a variety of tunnel barriers. This work is a review of our recent research on atomic layer deposition and post-fabrication treatments to fabricate metallic single electron transistors with a variety of metals and dielectrics.

Nano/micro particle beam for ceramic deposition and mechanical etching

International Nuclear Information System (INIS)

Chun, Doo-Man; Kim, Min-Saeng; Kim, Min-Hyeng; Ahn, Sung-Hoon; Yeo, Jun-Cheol; Lee, Caroline Sunyong

2010-01-01

Nano/micro particle beam (NPB) is a newly developed ceramic deposition and mechanical etching process. Additive (deposition) and subtractive (mechanical etching) processes can be realized in one manufacturing process using ceramic nano/micro particles. Nano- or micro-sized powders are sprayed through the supersonic nozzle at room temperature and low vacuum conditions. According to the process conditions, the ceramic powder can be deposited on metal substrates without thermal damage, and mechanical etching can be conducted in the same process with a simple change of process conditions and powders. In the present work, ceramic aluminum oxide (Al 2 O 3 ) thin films were deposited on metal substrates. In addition, the glass substrate was etched using a mask to make small channels. Deposited and mechanically etched surface morphology, coating thickness and channel depth were investigated. The test results showed that the NPB provides a feasible additive and subtractive process using ceramic powders.

Atomic-layer-deposited WNxCy thin films as diffusion barrier for copper metallization

International Nuclear Information System (INIS)

Kim, Soo-Hyun; Oh, Su Suk; Kim, Ki-Bum; Kang, Dae-Hwan; Li, Wei-Min; Haukka, Suvi; Tuominen, Marko

2003-01-01

The properties of WN x C y films deposited by atomic layer deposition (ALD) using WF 6 , NH 3 , and triethyl boron as source gases were characterized as a diffusion barrier for copper metallization. It is noted that the as-deposited film shows an extremely low resistivity of about 350 μΩ cm with a film density of 15.37 g/cm 3 . The film composition measured from Rutherford backscattering spectrometry shows W, C, and N of ∼48, 32, and 20 at. %, respectively. Transmission electron microscopy analyses show that the as-deposited film is composed of face-centered-cubic phase with a lattice parameter similar to both β-WC 1-x and β-W 2 N with an equiaxed microstructure. The barrier property of this ALD-WN x C y film at a nominal thickness of 12 nm deposited between Cu and Si fails only after annealing at 700 deg. C for 30 min

Krypton-85 storage in sputter-deposited amorphous metals

International Nuclear Information System (INIS)

Tingey, G.L.; McClanahan, E.D.; Lytle, J.M.; Gordon, N.R.; Knoll, R.W.

1982-06-01

After comparing options for storing radioactive krypton gas, the United States Department of Energy selected ion implantation of the gas into a sputter-deposited metal matrix as the reference process. This technique is being developed with pilot-scale testing and further characterization of the deposited product. The process involves implanting krypton atoms into a growing deposit during the sputtering process. An amorphous metal deposit of nominal composition Ni 0 81 La 0 09 Kr 0 10 has been selected for further studies because of the high krypton loading, high sputtering yield, relatively low cost of the metallic components, resistance to corrosion, and stability of the product. The krypton release from this amorphous metal is described as an activated diffusion process which increases linearly with the square root of time. Studies of krypton release rate as a function of temperature were completed and an activation energy for the diffusion of 70 kcal/mole obtained. From these data, we estimated that the krypton release during the first ten years would be 0.5% for a maximum temperature of 350 0 C. The actual release of the krypton during storage was projected to be lower by a factor of 10 7 with the maximum temperature only 220 0 C. Thermal analysis studies show two energy releases occurring with krypton-containing alloys: one associated with recrystallization of the amorphous alloy and a second associated with krypton release. The total energy release between 100 and 800 0 C was less than 50 cal/g. Estimates are given for the cost of operation of the ion implantation process for solidification of the krypton-85 from a 2000-tonne heavy metal/year reprocessing plant. The present value costs, in 1981 dollars including capital and operating costs and assuming a 30-year life, are about $26M for the lifetime of the plant. Annual energy consumption of the process was estimated to be 3.9 M kWh/year

Structural properties of WO{sub 3} dependent of the annealing temperature deposited by hot-filament metal oxide deposition

Energy Technology Data Exchange (ETDEWEB)

Flores M, J. E. [Benemerita Universidad Autonoma de Puebla, Facultad de Ciencias de la Electronica, Av. San Claudio y 18 Sur, Ciudad Universitaria, Col. Jardines de San Manuel, 72570 Puebla (Mexico); Diaz R, J. [IPN, Centro de Investigacion en Biotecnologia Aplicada, Ex-Hacienda de San Molino Km 1.5 Tepetitla, 90700 Tlaxcala (Mexico); Balderas L, J. A., E-mail: eflores@ece.buap.mx [IPN, Unidad Profesional Interdisciplinaria de Biotecnologia, Av. Acueducto s/n, Col. Barrio la Laguna, 07340 Mexico D. F. (Mexico)

2012-07-01

In this work presents a study of the effect of the annealing temperature on structural and optical properties of WO{sub 3} that has been grown by hot-filament metal oxide deposition. The chemical stoichiometry was determined by X-ray photoelectron spectroscopy. By X-ray diffraction obtained that the as-deposited WO{sub 3} films present mainly monoclinic crystalline phase. WO{sub 3} optical band gap energy can be varied from 2.92 to 3.15 eV obtained by transmittance measurements by annealing WO{sub 3} from 100 to 500 C. The Raman spectrum of the as-deposited WO{sub 3} film shows four intense peaks that are typical Raman peaks of crystalline WO{sub 3} (m-phase) that corresponds to the stretching vibrations of the bridging oxygen that are assigned to W-O stretching ({upsilon}) and W-O bending ({delta}) modes, respectively, which enhanced and increased their intensity with the annealing temperature. (Author)

Metal ion implantation: Conventional versus immersion

International Nuclear Information System (INIS)

Brown, I.G.; Anders, A.; Anders, S.; Dickinson, M.R.; MacGill, R.A.

1994-01-01

Vacuum-arc-produced metal plasma can be used as the ion feedstock material in an ion source for doing conventional metal ion implantation, or as the immersing plasma for doing plasma immersion ion implantation. The basic plasma production method is the same in both cases; it is simple and efficient and can be used with a wide range of metals. Vacuum arc ion sources of different kinds have been developed by the authors and others and their suitability as a metal ion implantation tool has been well established. Metal plasma immersion surface processing is an emerging tool whose characteristics and applications are the subject of present research. There are a number of differences between the two techniques, both in the procedures used and in the modified surfaces created. For example, the condensibility of metal plasma results in thin film formation and subsequent energetic implantation is thus done through the deposited layer; in the usual scenario, this recoil implantation and the intermixing it produces is a feature of metal plasma immersion but not of conventional energetic ion implantation. Metal plasma immersion is more suited (but not limited) to higher doses (>10 17 cm -2 ) and lower energies (E i < tens of keV) than the usual ranges of conventional metal ion implantation. These and other differences provide these vacuum-arc-based surface modification tools with a versatility that enhances the overall technological attractiveness of both

Deposition of metallic nanoparticles on carbon nanotubes via a fast evaporation process

International Nuclear Information System (INIS)

Ren Guoqiang; Xing Yangchuan

2006-01-01

A new technique was developed for the deposition of colloidal metal nanoparticles on carbon nanotubes. It involves fast evaporation of a suspension containing sonochemically functionalized carbon nanotubes and colloidal nanoparticles. It was demonstrated that metallic nanoparticles with different sizes and concentrations can be deposited on the carbon nanotubes with only a few agglomerates. The technique does not seem to be limited by what the nanoparticles are, and therefore would be applicable to the deposition of other nanoparticles on carbon nanotubes. PtPd and CoPt 3 alloy nanoparticles were used to demonstrate the deposition process. It was found that the surfactants used to disperse the nanoparticles can hinder the nanoparticle deposition. When the nanoparticles were washed with ethanol, they could be well deposited on the carbon nanotubes. The obtained carbon nanotube supported metal nanoparticles were characterized by transmission electron microscopy, energy dispersive x-ray spectroscopy, x-ray photoelectron spectroscopy, and cyclic voltammetry

Metallized ceramic vacuum pipe for particle beams

International Nuclear Information System (INIS)

Butler, B.L.; Featherby, M.

1990-01-01

A ceramic vacuum chamber segment in the form of a long pipe of rectangular cross section has been assembled from standard shapes of alumina ceramic using glass bonding techniques. Prior to final glass bonding, the internal walls of the pipe are metallized using an electroplating technology. These advanced processes allow for precision patterning and conductivity control of surface conducting films. The ability to lay down both longitudinal and transverse conductor patterns separated by insulating layers of glass give the accelerator designer considerable freedom in tailoring longitudinal and transverse beam pipe impedances. Assembly techniques of these beam pipes are followed through two iterations of semi-scale pipe sections made using candidate materials and processes. These demonstrate the feasibility of the concepts and provide parts for electrical characterization and for further refinement of the approach. In a parallel effort, a variety of materials, joining processes and assembly procedures have been tried to assure flexibility and reliability in the construction of 10-meter long sections to any required specifications

Vacuum arc plasma deposition of thin titanium dioxide films on silicone elastomer as a functional coating for medical applications

Energy Technology Data Exchange (ETDEWEB)

Boudot, Cécile, E-mail: cecile.boudot@tum.de [Technical University of Munich, Department of Mechanical Engineering, Boltzmannstraße 15, D-85748 Garching bei München (Germany); Kühn, Marvin; Kühn-Kauffeldt, Marina; Schein, Jochen [Institute for Plasma Technology and Mathematics, University of Federal Armed Forces Munich, Werner-Heisenberg-Weg 39, D-85577 Neubiberg (Germany)

2017-05-01

Silicone elastomer is a promising material for medical applications and is widely used for implants with blood and tissue contact. However, its strong hydrophobicity limits adhesion of tissue cells to silicone surfaces, which can impair the healing process. To improve the biological properties of silicone, a triggerless pulsed vacuum cathodic arc plasma deposition technique was applied to deposit titanium dioxide (TiO{sub 2}) films onto the surface. Scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy, Raman spectroscopy and contact angle measurements were used for coating characterization. Deposited films were about 150 nm thick and exhibited good adhesion to the underlying silicone substrate. Surface wettability and roughness both increased after deposition of the TiO{sub 2} layer. In addition, cell-biological investigations demonstrated that the in-vitro cytocompatibility of TiO{sub 2}-coated samples was greatly improved without impacting silicone's nontoxicity. For validation of use in medical devices, further investigations were conducted and demonstrated stability of surface properties in an aqueous environment for a period of 68 days and the coating's resistance to several sterilization methods. - Highlights: • Vacuum arc plasma was applied to deposit titanium dioxide films onto silicone. • Thickness, roughness and composition of the films were determined. • Cytocompatibility of coated silicone elastomer is greatly improved. • Films have good adhesion to the substrate and are stable, non-toxic and sterilizable.

Oxide cathodes produced by plasma deposition

International Nuclear Information System (INIS)

Scheitrum, G.; Caryotakis, G.; Pi, T.; Umstattd, R.; Brown, I.; Montiero, O.

1997-01-01

These are two distinct applications for high-current-density, long-life thermionic cathodes. The first application is as a substitute for explosive emission cathodes used in high-power microwave (HPM) devices being developed for Air Force programs. The second application is in SLAC's X-band klystrons for the Next Linear Collider (NLC). SLAC, UCD, and LBL are developing a plasma deposition process that eliminates the problems with binders, carbonate reduction, peeling, and porosity. The emission layer is deposited using plasma deposition of metallic barium in vacuum with an oxygen background gas. An applied bias voltage drives the oxide plasma into the nickel surface. Since the oxide is deposited directly, it does not have problems with poisoning from a hydrocarbon binder. The density of the oxide layer is increased from the 40--50% for standard oxide cathodes to nearly 100% for plasma deposition

Atmospheric heavy metal deposition accumulated in rural forest soils of southern Scandinavia

DEFF Research Database (Denmark)

Hovmand, Mads Frederik; Kemp, Kaare; Kystol, J.

2008-01-01

Thirty-three years of measurements of atmospheric heavy metal (HM) deposition (bulk precipitation) in Denmark combined with European emission inventories form the basis for calculating a 50-year accumulated atmospheric input to a remote forest plantation on the island of Laesoe. Soil samples taken...... in atmospheric deposition and in soils. The accumulated atmospheric deposition is of the same magnitude as the increase of these metals in the top soil....

The role of oxygen in the deposition of copper–calcium thin film as diffusion barrier for copper metallization

Energy Technology Data Exchange (ETDEWEB)

Yu, Zhinong, E-mail: znyu@bit.edu.cn [School of Optoelectronics and Beijing Engineering Research Center of Mixed Reality and Advanced Display, Beijing Institute of Technology, Beijing 100081 (China); Ren, Ruihuang [School of Optoelectronics and Beijing Engineering Research Center of Mixed Reality and Advanced Display, Beijing Institute of Technology, Beijing 100081 (China); Xue, Jianshe; Yao, Qi; Li, Zhengliang; Hui, Guanbao [Beijing BOE Optoelectronics Technology Co., Ltd, Beijing 100176 (China); Xue, Wei [School of Optoelectronics and Beijing Engineering Research Center of Mixed Reality and Advanced Display, Beijing Institute of Technology, Beijing 100081 (China)

2015-02-15

Highlights: • The CuCa film as the diffusion barrier of Cu film improves the adhesion of Cu film. • The introduction of oxygen into the deposition of CuCa film is necessary to improve the adhesion of Cu film. • The CuCa alloy barrier layer deposited at oxygen atmosphere has perfect anti-diffusion between Cu film and substrate. - Abstract: The properties of copper (Cu) metallization based on copper–calcium (CuCa) diffusion barrier as a function of oxygen flux in the CuCa film deposition were investigated in view of adhesion, diffusion and electronic properties. The CuCa film as the diffusion barrier of Cu film improves the adhesion of Cu film, however, and increases the resistance of Cu film. The introduction of oxygen into the deposition of CuCa film induces the improvement of adhesion and crystallinity of Cu film, but produces a slight increase of resistance. The increased resistance results from the partial oxidation of Cu film. The annealing process in vacuum further improves the adhesion, crystallinity and conductivity of Cu film. X-ray diffraction (XRD) and Auger electron spectroscopy (AES) show that the CuCa alloy barrier layer deposited at oxygen atmosphere has perfect anti-diffusion between Cu film and substrate due to the formation of Ca oxide in the interface of CuCa/substrate.

Low pressure plasma spray deposition of W-Ni-Fe alloy

International Nuclear Information System (INIS)

Mutasim, Z.Z.; Smith, R.W.

1991-01-01

The production of net shape refractory metal structural preforms are increasing in importance in chemical processing, defense and aerospace applications. Conventional methods become limited for refractory metal processing due to the high melting temperatures and fabrication difficulties. Plasma spray forming, a high temperature process, has been shown to be capable of refractory metal powder consolidation in net shape products. The research reported here has evaluated this method for the deposition of heavy tungsten alloys. Plasma Melted Rapidly Solidified (PMRS) W 8%Ni-2%Fe refractory metal powders were spray formed using vacuum plasma spray (VPS) process and produced 99% dense, fine grain and homogeneous microstructures. In this paper plasma operating parameters (plasma arc gas type and flowrate plasma gun nozzle size and spray distance) were studied and their effects on deposit's density and microstructure are reported

An investigation on high temperature fatigue properties of tempered nuclear-grade deposited weld metals

Science.gov (United States)

Cao, X. Y.; Zhu, P.; Yong, Q.; Liu, T. G.; Lu, Y. H.; Zhao, J. C.; Jiang, Y.; Shoji, T.

2018-02-01

Effect of tempering on low cycle fatigue (LCF) behaviors of nuclear-grade deposited weld metal was investigated, and The LCF tests were performed at 350 °C with strain amplitudes ranging from 0.2% to 0.6%. The results showed that at a low strain amplitude, deposited weld metal tempered for 1 h had a high fatigue resistance due to high yield strength, while at a high strain amplitude, the one tempered for 24 h had a superior fatigue resistance due to high ductility. Deposited weld metal tempered for 1 h exhibited cyclic hardening at the tested strain amplitudes. Deposited weld metal tempered for 24 h exhibited cyclic hardening at a low strain amplitude but cyclic softening at a high strain amplitude. Existence and decomposition of martensite-austenite (M-A) islands as well as dislocations activities contributed to fatigue property discrepancy among the two tempered deposited weld metal.

Metal Nanoparticles Deposited on Porous Silicon Templates as Novel Substrates for SERS

Directory of Open Access Journals (Sweden)

Lara Mikac

2015-12-01

Full Text Available In this paper, results on preparation of stable and uniform SERS solid substrates using macroporous silicon (pSi with deposited silver and gold are presented. Macroporous silicon is produced by anodisation of p-type silicon in hydrofluoric acid. The as prepared pSi is then used as a template for Ag and Au depositions. The noble metals were deposited in three different ways: by immersion in silver nitrate solution, by drop-casting silver colloidal solution and by pulsed laser ablation (PLA. Substrates obtained by different deposition processes were evaluated for SERS efficiency using methylene blue (MB and rhodamine 6G (R6G at 514.5, 633 and 785 nm. Using 514.5 nm excitation and R6G the limits of detection (LOD for macroporous Si samples with noble metal nanostructures obtained by immersion of pSi sample in silver nitrate solution and by applying silver colloidal solution to pSi template were 10–9 M and 10–8 M respectively. Using 633 nm laser and MB the most noticeable SERS activity gave pSi samples ablated with 30000 and 45000 laser pulses where the LODs of 10–10 M were obtained. The detection limit of 10–10 M was also reached for 4 mA cm–2-15 min pSi sample, silver ablated with 30000 pulses. Macroporous silicon proved to be a good base for the preparation of SERS substrates.

Issues involved in the atomic layer deposition of metals

Science.gov (United States)

Grubbs, Robert Kimes

Auger Electron Spectroscopy (AES) was used to study the nucleation and growth of tungsten on aluminum oxide surfaces. Tungsten metal was deposited using Atomic Layer Deposition (ALD) techniques. ALD uses sequential surface reactions to deposit material with atomic layer control. W ALD is performed using sequential exposures of WF6 and Si2H6. The step-wise nature of W ALD allows nucleation studies to be performed by analyzing the W surface concentration after each ALD reaction. Nucleation and growth regions can be identified by quantifying the AES signal intensities from both the W surface and the Al2O3 substrate. W nucleation occurred in 3 ALD reaction cycles. The AES results yielded a nucleation rate of 1.0 A/ALD cycle and a growth rate of ≈3 A/ALD cycle. AES studies also explored the nucleation and growth of Al2O3 on W. Al2O3 nucleated in 1 ALD cycle giving a nucleation rate of 3.5 A/ALD cycle and a subsequent growth rate of 1.0 A/ALD cycle. Mass spectrometry was then used to study the ALD reaction chemistry of tungsten deposition. Because of the step-wise nature of the W ALD chemistry, each W ALD reaction could be studied independently. The gaseous mass products were identified from both the WF6 and Si2H6 reactions. H2, HF and SiF4 mass products were observed for the WF6 reaction. The Si2H6 reaction displayed a room temperature reaction and a 200°C reaction. Products from the room temperature Si2H6 reaction were H2 and SiF3H. The reaction at 200°C yielded only H2 as a reaction product. H2 desorption from the surface contributes to the 200°C Si2H6 reaction. AES was used to confirm that the gas phase reaction products are correlated with a change in the surface species. Atomic hydrogen reduction of metal halides and oganometallic compounds provides another method for depositing metals with atomic layer control. The quantity of atomic hydrogen necessary to perform this chemistry is critical to the metal ALD process. A thermocouple probe was constructed to

Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates

Energy Technology Data Exchange (ETDEWEB)

Brennan, Christopher J.; Neumann, Christopher M.; Vitale, Steven A., E-mail: steven.vitale@ll.mit.edu [Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02420 (United States)

2015-07-28

Fully depleted silicon-on-insulator transistors were fabricated using two different metal gate deposition mechanisms to compare plasma damage effects on gate oxide quality. Devices fabricated with both plasma-enhanced atomic-layer-deposited (PE-ALD) TiN gates and magnetron plasma sputtered TiN gates showed very good electrostatics and short-channel characteristics. However, the gate oxide quality was markedly better for PE-ALD TiN. A significant reduction in interface state density was inferred from capacitance-voltage measurements as well as a 1200× reduction in gate leakage current. A high-power magnetron plasma source produces a much higher energetic ion and vacuum ultra-violet (VUV) photon flux to the wafer compared to a low-power inductively coupled PE-ALD source. The ion and VUV photons produce defect states in the bulk of the gate oxide as well as at the oxide-silicon interface, causing higher leakage and potential reliability degradation.

Production of ceramic-metal joints for high-vacuum applications and development of simulation program for discharge tube

Energy Technology Data Exchange (ETDEWEB)

Kang, S. H.; Chung, K. H. [Seoul National University, Seoul (Korea)

2000-04-01

To develop a ceramic-metal jointed tube for high-vacuum applications, metalizing process and active metal brazing were investigated. Active metal brazing was adopted as a joining process to produce a high-vacuum tube which had high joint strength and reliability. A possibility for the development of new composition of Mo-Mn paste was studied. Also, to improve the strength and reliability of active metal brazed joint, TiN coating was introduced as a diffusion barrier. It was revealed that TiN coating could improve the joint strength and reliability. 100mm {phi} tube joint was produced using incusil ABA brazing alloy. The strength and reliability of manufactured tube showed higher value than commercial one. The electric field distribution in ceramic tube under high voltage was analyzed. Two dimensional electric field distribution was investigated under the existence of charged particles. From this result, electric field distribution at the surface of ceramic tube and the location of high electric field was predicted. Finally, Arc discharge was simulated to analyze the effect of arc discharge on the discharge tube wall. The maximum temperature of arc was 12000-13000K. The wall temperature was increased 100-170K by the arc discharge. 45 refs., 57 figs., 4 tabs. (Author)

Experimental and numerical study of the chemical composition of WSex thin films obtained by pulsed laser deposition in vacuum and in a buffer gas atmosphere

International Nuclear Information System (INIS)

Grigoriev, S.N.; Fominski, V.Yu.; Gnedovets, A.G.; Romanov, R.I.

2012-01-01

WSe x thin films were obtained by pulsed laser deposition in vacuum and at various Ar gas pressures up to 10 Pa. Stoichiometry and chemical state of the WSe x films were studied by means of Rutherford backscattering spectrometry and X-ray photoelectron spectroscopy. In the case of pulsed laser deposition of WSe x films in vacuum the value of stoichiometric coefficient x was 1.3. During the deposition in argon at pressures of 2-10 Pa the value of x varied from 1.5 to 2.2. To explain the influence of the buffer gas, a model was used that takes into account the following processes: (1) congruent pulsed laser evaporation of the WSe 2.2 target; (2) scattering of laser-evaporated W and Se atoms in Ar; (3) sputtering of the deposited film by high-energy atoms from the laser plume. Experimentally, the velocity distributions of laser-evaporated W and Se atoms in vacuum were determined by the time-of-flight measurements. Collision Monte Carlo simulations were used to quantify the impact of the buffer gas on the energy and the incidence angle distributions of the deposited W and Se atoms. Model distributions were used to determine the chemical composition of the WSe x films, depending on the efficiency of the preferential sputtering of Se atoms.

Fabrication and characterisation of ligand-functionalised ultrapure monodispersed metal nanoparticle nanoassemblies employing advanced gas deposition technique

Science.gov (United States)

Geremariam Welearegay, Tesfalem; Cindemir, Umut; Österlund, Lars; Ionescu, Radu

2018-02-01

Here, we report for the first time the fabrication of ligand-functionalised ultrapure monodispersed metal nanoparticles (Au, Cu, and Pt) from their pure metal precursors using the advanced gas deposition technique. The experimental conditions during nanoparticle formation were adjusted in order to obtain ultrafine isolated nanoparticles on different substrates. The morphology and surface analysis of the as-deposited metal nanoparticles were investigated using scanning electron microscopy, x-ray diffraction and Fourier transform infra-red spectroscopy, which demonstrated the formation of highly ordered pure crystalline nanoparticles with a relatively uniform size distribution of ∼10 nm (Au), ∼4 nm (Cu) and ∼3 nm (Pt), respectively. A broad range of organic ligands containing thiol or amine functional groups were attached to the nanoparticles to form continuous networks of nanoparticle-ligand nanoassemblies, which were characterised by scanning electron microscopy and x-ray photoelectron spectroscopy. The electrical resistance of the functional nanoassemblies deposited in the gap spacing of two microfabricated parallel Au electrodes patterned on silicon substrates ranged between tens of kΩ and tens of MΩ, which is suitable for use in many applications including (bio)chemical sensors, surface-enhanced Raman spectroscopy and molecular electronic rectifiers.

Regional monitoring of metals in the Munich metropolitan area: Comparison of biomonitoring (standardized grass culture) with deposition and airborne particles

International Nuclear Information System (INIS)

Dietl, C.; Reifenhaeuser, W.; Vierle, O.; Peichl, L.; Faus-Kessler, Th.

2000-01-01

In the Munich metropolitan area a close association of lead (Pb) and antimony (Sb) impacts with traffic was observed in 1992 and 1993. The intercorrelation of both metals was found by samples of standardised grass cultures and was reflected by deposition sampling, too. With respect to location-specific variations, however, both methods revealed differing gradients of Pb and Sb concentrations with increasing distance from traffic. It appeared that Sb variations according to traffic implications were particularly well indicated by means of biomonitoring, while Pb variations were not indicated adequately. As a result, a special qualification of grass to selectively collect metals on airborne dust according to particle sizes was suggested. Further investigations on the correlations between metal biomonitoring, metal deposition and airborne metals in 1994 - 1996 corroborated method-specific sampling features. They in turn showed that one interference is the individual prevalence of the metals on different particle sizes. (author)

Modeling film uniformity and symmetry in ionized metal physical vapor deposition with cylindrical targets

International Nuclear Information System (INIS)

Lu Junqing; Yang Lin; Yoon, Jae Hong; Cho, Tong Yul; Tao Guoqing

2008-01-01

Severe asymmetry of the metal deposits on the trench sidewalls occurs near the wafer edge during low pressure ionized metal physical vapor deposition of Cu seed layer for microprocessor interconnects. To investigate this process and mitigate the asymmetry, an analytical view factor model based on the analogy between metal sputtering and diffuse thermal radiation was constructed to investigate deposition uniformity and symmetry for cylindrical target sputtering in low pressure (below 0.1 Pa) ionized Cu physical vapor deposition. The model predictions indicate that as the distance from the cylindrical target to wafer increases, the metal film thickness becomes more uniform across the wafer and the asymmetry of the metal deposits at the wafer edge increases significantly. These trends are similar to those for planar targets. To minimize the asymmetry, the height of the cylindrical target should be kept at a minimum. For cylindrical targets, the outward-facing sidewall of the trench could receive more direct Cu fluxes than the inward-facing one when the target to wafer distance is short. The predictions also indicate that increasing the diameter of the cylindrical target could significantly reduce the asymmetry in metal deposits at the wafer edge and make the film thickness more uniform across the wafer

Calculation of the process of vacuum drying of a metal-concrete container with spent nuclear fuel

Science.gov (United States)

Karyakin, Yu. E.; Lavrent'ev, S. A.; Pavlyukevich, N. V.; Pletnev, A. A.; Fedorovich, E. D.

2012-01-01

An algorithm and results of calculation of the process of vacuum drying of a metal-concrete container intended for long-term "dry" storage of spent nuclear fuel are presented. A calculated substantiation of the initial amount of moisture in the container is given.

Co-deposition of metallic actinides on a solid cathode

Energy Technology Data Exchange (ETDEWEB)

Limmer, S. J.; Williamson, M. A.; Willit, J. L. [Argonne National Laboratory, Argonne (United States)

2008-08-15

The amount of rare earth contamination that will be found in a co-deposit of actinides is a function of the type of cathode used. A non-alloying solid cathode will result in a significantly lower rare earth contamination in the actinide co-deposit than a liquid cadmium cathode. With proper control of the cathode potential vs. a stable reference electrode, co-deposition of uranium with other more electroactive metals has been demonstrated using a non-alloying solid cathode.

Co-deposition of metallic actinides on a solid cathode

International Nuclear Information System (INIS)

Limmer, S. J.; Williamson, M. A.; Willit, J. L.

2008-01-01

The amount of rare earth contamination that will be found in a co-deposit of actinides is a function of the type of cathode used. A non-alloying solid cathode will result in a significantly lower rare earth contamination in the actinide co-deposit than a liquid cadmium cathode. With proper control of the cathode potential vs. a stable reference electrode, co-deposition of uranium with other more electroactive metals has been demonstrated using a non-alloying solid cathode

Comparison of radiation detector performance for different metal contacts on CdZnTe deposited by electroless deposition method

Energy Technology Data Exchange (ETDEWEB)

Zheng, Q.; Dierre, F.; Crocco, J.; Bensalah, H.; Dieguez, E. [Crystal Growth Laboratory, Department of Materials Physics, Universidad Autonoma de Madrid, 28049 Madrid (Spain); Ayoub, M. [Durham Scientific Crystals Laboratory, Netpark, Thomas Wright Way, Sedgefield, TS21, 3FD (United Kingdom); Corregidor, V.; Alves, E. [Unidade de Fisica e Aceleradores, LFI, ITN, E.N.10, 2686-953, Sacavem (Portugal); Fernandez-Ruiz, R. [Servicio Interdepartamental de Investigacion. Laboratorio de TXRF/Laue-XRD. Facultad de Ciencias, Universidad Autonoma de Madrid, 28049 Madrid (Spain); Perez, J.M. [CIEMAT, Edificio 22, Avda Complutense 22, 28040 Madrid (Spain)

2011-11-15

A comparative study of four different metals gold (Au), platinum (Pt), ruthenium (Ru) and rhodium (Rh) deposited on CdZnTe(CZT) by the electroless deposition method has been carried out. Two of these materials, Ru and Rh, have been deposited for the first time by this method. In contrast to the Pt deposition, the deposition of Ru and Rh were not carried out under the optimal conditions. The metals deposited on the samples were identified by Total reflection X-ray Fluorescence (TXRF). Rutherford Backscattering Spectrometry (RBS) analyses show that Au forms the thickest layer ({proportional_to}160 nm) for the experimental conditions of this work. Current-voltage measurements show that Pt forms a more linear ohmic contact with the lowest leakage current. A {sup 57}Co gamma ray spectrum gave a better detector performance with a FWHM 11 keV at 122 keV. (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

Atmospheric heavy metal deposition in the Copenhagen area

Energy Technology Data Exchange (ETDEWEB)

Andersen, A; Hovmand, M F; Johnsen, I

1978-10-01

Transport of heavy metals from the atmosphere to the soil and vegetation takes place by dust fall, bulk precipitation, and gas/aerosol adsorption processes. Atmospheric dry and wet deposition of the heavy metals lead, zinc, nickel, vanadium, iron, and copper over the Copenhagen area was measured by sampling in plastic funnels from 17 stations throughout the area for 12 months. Epigeic bryophytes, epiphytic lichen, and topsoil samples were analyzed. A linear correlation between bulk precipitation and heavy metal concentration in lichens and bryophytes was found. An exponential correlation between bulk precipitation and heavy metal concentration in soil was noted. Regional variation of the heavy metal levels in the Copenhagen area was described, and three sub-areas with high metal burdens were distinguished. (10 diagrams, 8 graphs, 13 references, 2 tables)

Model of liquid-metal splashing in the cathode spot of a vacuum arc discharge

International Nuclear Information System (INIS)

Gashkov, M. A.; Zubarev, N. M.; Zubareva, O. V.; Mesyats, G. A.; Uimanov, I. V.

2016-01-01

The formation of microjets is studied during the extrusion of a melted metal by the plasma pressure from craters formed on a cathode in a burning vacuum arc. An analytic model of liquid-metal splashing that includes two stages is proposed. At the first stage, the liquid motion has the axial symmetry and a liquid-metal wall surrounding the crater is formed. At the second stage, the axial symmetry is broken due to the development of the Plateau–Rayleigh instability in the upper part of the wall. The wall breakup process is shown to have a threshold. The minimal plasma pressure and the minimal electric current flowing through the crater required for obtaining the liquid-metal splashing regime are found. The basic spatial and temporal characteristics of the jet formation process are found using the analytic model.

Assessment of heavy metals in loose deposits in drinking water distribution system.

Science.gov (United States)

Liu, Quanli; Han, Weiqiang; Han, Bingjun; Shu, Min; Shi, Baoyou

2018-06-09

Heavy metal accumulation and potential releases from loose deposits in drinking water distribution system (DWDS) can have critical impacts on drinking water safety, but the associated risks have not been sufficiently evaluated. In this work, the potential biological toxicity of heavy metals in loose deposits was calculated based on consensus-based sediment quality guidelines, and the effects of some of the main water quality parameters, such as the pH and bicarbonate and phosphate content, on the release behaviors of pre-accumulated heavy metals were investigated. The results showed that heavy metals (Cu, As, Cr, Pb, and Cd) significantly accumulated in all the samples, but the contents of the heavy metals were multiple magnitudes lower than the Fe and Mn contents. The potential biotoxicity of As and Cu was relatively high, but the biotoxicity of Cd was negligible. The water quality can significantly influence the release of heavy metals from loose deposits. As the pH increased from 7.0 to 9.0, the release of As and Cr obviously increased. The release of As, Cu, Pb, and Cr also accelerated with the addition of phosphate (from 1 to 5 mg/L). In contrast to the trends for the pH and phosphate, variations in the bicarbonate content did not have a significant influence on the release of As and Cr. The release ratios of heavy metals in the samples were very low, and there was not a correlation between the release rate of the heavy metals in the loose deposits and their potential biotoxicity.

Numerical modeling of carrier gas flow in atomic layer deposition vacuum reactor: A comparative study of lattice Boltzmann models

International Nuclear Information System (INIS)

Pan, Dongqing; Chien Jen, Tien; Li, Tao; Yuan, Chris

2014-01-01

This paper characterizes the carrier gas flow in the atomic layer deposition (ALD) vacuum reactor by introducing Lattice Boltzmann Method (LBM) to the ALD simulation through a comparative study of two LBM models. Numerical models of gas flow are constructed and implemented in two-dimensional geometry based on lattice Bhatnagar–Gross–Krook (LBGK)-D2Q9 model and two-relaxation-time (TRT) model. Both incompressible and compressible scenarios are simulated and the two models are compared in the aspects of flow features, stability, and efficiency. Our simulation outcome reveals that, for our specific ALD vacuum reactor, TRT model generates better steady laminar flow features all over the domain with better stability and reliability than LBGK-D2Q9 model especially when considering the compressible effects of the gas flow. The LBM-TRT is verified indirectly by comparing the numerical result with conventional continuum-based computational fluid dynamics solvers, and it shows very good agreement with these conventional methods. The velocity field of carrier gas flow through ALD vacuum reactor was characterized by LBM-TRT model finally. The flow in ALD is in a laminar steady state with velocity concentrated at the corners and around the wafer. The effects of flow fields on precursor distributions, surface absorptions, and surface reactions are discussed in detail. Steady and evenly distributed velocity field contribute to higher precursor concentration near the wafer and relatively lower particle velocities help to achieve better surface adsorption and deposition. The ALD reactor geometry needs to be considered carefully if a steady and laminar flow field around the wafer and better surface deposition are desired

Numerical modeling of carrier gas flow in atomic layer deposition vacuum reactor: A comparative study of lattice Boltzmann models

Energy Technology Data Exchange (ETDEWEB)

Pan, Dongqing; Chien Jen, Tien [Department of Mechanical Engineering, University of Wisconsin-Milwaukee, Milwaukee, Wisconsin 53201 (United States); Li, Tao [School of Mechanical Engineering, Dalian University of Technology, Dalian 116024 (China); Yuan, Chris, E-mail: cyuan@uwm.edu [Department of Mechanical Engineering, University of Wisconsin-Milwaukee, 3200 North Cramer Street, Milwaukee, Wisconsin 53211 (United States)

2014-01-15

This paper characterizes the carrier gas flow in the atomic layer deposition (ALD) vacuum reactor by introducing Lattice Boltzmann Method (LBM) to the ALD simulation through a comparative study of two LBM models. Numerical models of gas flow are constructed and implemented in two-dimensional geometry based on lattice Bhatnagar–Gross–Krook (LBGK)-D2Q9 model and two-relaxation-time (TRT) model. Both incompressible and compressible scenarios are simulated and the two models are compared in the aspects of flow features, stability, and efficiency. Our simulation outcome reveals that, for our specific ALD vacuum reactor, TRT model generates better steady laminar flow features all over the domain with better stability and reliability than LBGK-D2Q9 model especially when considering the compressible effects of the gas flow. The LBM-TRT is verified indirectly by comparing the numerical result with conventional continuum-based computational fluid dynamics solvers, and it shows very good agreement with these conventional methods. The velocity field of carrier gas flow through ALD vacuum reactor was characterized by LBM-TRT model finally. The flow in ALD is in a laminar steady state with velocity concentrated at the corners and around the wafer. The effects of flow fields on precursor distributions, surface absorptions, and surface reactions are discussed in detail. Steady and evenly distributed velocity field contribute to higher precursor concentration near the wafer and relatively lower particle velocities help to achieve better surface adsorption and deposition. The ALD reactor geometry needs to be considered carefully if a steady and laminar flow field around the wafer and better surface deposition are desired.

Deposition and characterization of noble metal onto surfaces of 304l stainless steel

International Nuclear Information System (INIS)

Contreras R, A.; Arganis J, C. R.; Aguilar T, J. A.; Medina A, A. L.

2010-10-01

Noble metal chemical addition (NMCA) plus hydrogen water chemistry is an industry-wide accepted approach for potential intergranular stress corrosion cracking mitigation of BWR internals components. NMCA is a method of applying noble metal onto BWR internals surfaces using reactor water as the transport medium that causes the deposition of noble metal from the liquid onto surfaces. In this work different platinum concentration solutions were deposited onto pre-oxidized surfaces of 304l steel at 180 C during 48 hr in an autoclave. In order to simulate the zinc water conditions, deposits of Zn and Pt-Zn were also carried out. The solutions used to obtain the deposits were: sodium hexahydroxyplatinate (IV), zinc nitrate hydrate and zinc oxide. The deposits obtained were characterized by scanning electron microscopy and X-ray diffraction. Finally, the electrochemical corrosion potential of pre-oxidized samples with Pt deposit were obtained and compared with the electrochemical corrosion potential of only pre-oxidized samples. (Author)

Electrochemically induced maskless metal deposition on micropore wall.

Science.gov (United States)

Liu, Jie; Hébert, Clément; Pham, Pascale; Sauter-Starace, Fabien; Haguet, Vincent; Livache, Thierry; Mailley, Pascal

2012-05-07

By applying an external electric field across a micropore via an electrolyte, metal ions in the electrolyte can be reduced locally onto the inner wall of the micropore, which was fabricated in a silica-covered silicon membrane. This maskless metal deposition on the silica surface is a result of the pore membrane polarization in the electric field. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

A study of the performance and properties of diamond like carbon (DLC) coatings deposited by plasma chemical vapor deposition (CVD) for two stroke engine components

Energy Technology Data Exchange (ETDEWEB)

Tither, D. [BEP Grinding Ltd., Manchester (United Kingdom); Ahmed, W.; Sarwar, M.; Penlington, R. [Univ. of Northumbria, Newcastle-upon-Tyne (United Kingdom)

1995-12-31

Chemical vapor deposition (CVD) using microwave and RF plasma is arguably the most successful technique for depositing diamond and diamond like carbon (DLC) films for various engineering applications. However, the difficulties of depositing diamond are nearly as extreme as it`s unique combination of physical, chemical and electrical properties. In this paper, the modified low temperature plasma enhanced CVD system is described. The main focus of this paper will be work related to deposition of DLC on metal matrix composite materials (MMCs) for application in two-stroke engine components and results will be presented from SEM, mechanical testing and composition analysis studies. The authors have demonstrated the feasibility of depositing DLC on MMCs for the first time using a vacuum deposition process.

Cu and Cu(Mn) films deposited layer-by-layer via surface-limited redox replacement and underpotential deposition

Energy Technology Data Exchange (ETDEWEB)

Fang, J.S., E-mail: jsfang@nfu.edu.tw [Department of Materials Science and Engineering, National Formosa University, Huwei 63201, Taiwan (China); Sun, S.L. [Department of Materials Science and Engineering, National Formosa University, Huwei 63201, Taiwan (China); Cheng, Y.L. [Department of Electrical Engineering, National Chi-Nan University, Nan-Tou 54561, Taiwan (China); Chen, G.S.; Chin, T.S. [Department of Materials Science and Engineering, Feng Chia University, Taichung 40724, Taiwan (China)

2016-02-28

Graphical abstract: - Abstract: The present paper reports Cu and Cu(Mn) films prepared layer-by-layer using an electrochemical atomic layer deposition (ECALD) method. The structure and properties of the films were investigated to elucidate their suitability as Cu interconnects for microelectronics. Previous studies have used primarily a vacuum-based atomic layer deposition to form a Cu metallized film. Herein, an entirely wet chemical process was used to fabricate a Cu film using the ECALD process by combining underpotential deposition (UPD) and surface-limited redox replacement (SLRR). The experimental results indicated that an inadequate UPD of Pb affected the subsequent SLRR of Cu and lead to the formation of PbSO{sub 4}. A mechanism is proposed to explain the results. Layer-by-layer deposition of Cu(Mn) films was successfully performed by alternating the deposition cycle-ratios of SLRR-Cu and UPD-Mn. The proposed self-limiting growth method offers a layer-by-layer wet chemistry-based deposition capability for fabricating Cu interconnects.

Magnetron target designs to improve wafer edge trench filling in ionized metal physical vapor deposition

International Nuclear Information System (INIS)

Lu Junqing; Yoon, Jae-Hong; Shin, Keesam; Park, Bong-Gyu; Yang Lin

2006-01-01

Severe asymmetry of the metal deposits on the trench sidewalls occurs near the wafer edge during low pressure ionized metal physical vapor deposition of Cu seed layer for microprocessor interconnects. To investigate this process and mitigate the asymmetry, an analytical view factor model based on the analogy between metal sputtering and diffuse thermal radiation was constructed. The model was validated based on the agreement between the model predictions and the reported experimental values for the asymmetric metal deposition at trench sidewalls near the wafer edge for a 200 mm wafer. This model could predict the thickness of the metal deposits across the wafer, the symmetry of the deposits on the trench sidewalls at any wafer location, and the angular distributions of the metal fluxes arriving at any wafer location. The model predictions for the 300 mm wafer indicate that as the target-to-wafer distance is shortened, the deposit thickness increases and the asymmetry decreases, however the overall uniformity decreases. Up to reasonable limits, increasing the target size and the sputtering intensity for the outer target portion significantly improves the uniformity across the wafer and the symmetry on the trench sidewalls near the wafer edge

Synthesis of 2D Metal Chalcogenide Thin Films through the Process Involving Solution-Phase Deposition.

Science.gov (United States)

Giri, Anupam; Park, Gyeongbae; Yang, Heeseung; Pal, Monalisa; Kwak, Junghyeok; Jeong, Unyong

2018-04-24

2D metal chalcogenide thin films have recently attracted considerable attention owing to their unique physicochemical properties and great potential in a variety of applications. Synthesis of large-area 2D metal chalcogenide thin films in controllable ways remains a key challenge in this research field. Recently, the solution-based synthesis of 2D metal chalcogenide thin films has emerged as an alternative approach to vacuum-based synthesis because it is relatively simple and easy to scale up for high-throughput production. In addition, solution-based thin films open new opportunities that cannot be achieved from vacuum-based thin films. Here, a comprehensive summary regarding the basic structures and properties of different types of 2D metal chalcogenides, the mechanistic details of the chemical reactions in the synthesis of the metal chalcogenide thin films, recent successes in the synthesis by different reaction approaches, and the applications and potential uses is provided. In the last perspective section, the technical challenges to be overcome and the future research directions in the solution-based synthesis of 2D metal chalcogenides are discussed. © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Titanium dioxide antireflection coating for silicon solar cells by spray deposition

Science.gov (United States)

Kern, W.; Tracy, E.

1980-01-01

A high-speed production process is described for depositing a single-layer, quarter-wavelength thick antireflection coating of titanium dioxide on metal-patterned single-crystal silicon solar cells for terrestrial applications. Controlled atomization spraying of an organotitanium solution was selected as the most cost-effective method of film deposition using commercial automated equipment. The optimal composition consists of titanium isopropoxide as the titanium source, n-butyl acetate as the diluent solvent, sec-butanol as the leveling agent, and 2-ethyl-1-hexanol to render the material uniformly depositable. Application of the process to the coating of circular, large-diameter solar cells with either screen-printed silver metallization or with vacuum-evaporated Ti/Pd/Ag metallization showed increases of over 40% in the electrical conversion efficiency. Optical characteristics, corrosion resistance, and several other important properties of the spray-deposited film are reported. Experimental evidence indicates a wide tolerance in the coating thickness upon the overall efficiency of the cell. Considerations pertaining to the optimization of AR coatings in general are discussed, and a comprehensive critical survey of the literature is presented.

ELECTROCATALYSIS ON SURFACES MODIFIED BY METAL MONOLAYERS DEPOSITED AT UNDERPOTENTIALS.

Energy Technology Data Exchange (ETDEWEB)

ADZIC,R.

2000-12-01

The remarkable catalytic properties of electrode surfaces modified by monolayer amounts of metal adatoms obtained by underpotential deposition (UPD) have been the subject of a large number of studies during the last couple of decades. This interest stems from the possibility of implementing strictly surface modifications of electrocatalysts in an elegant, well-controlled way, and these bi-metallic surfaces can serve as models for the design of new catalysts. In addition, some of these systems may have potential for practical applications. The UPD of metals, which in general involves the deposition of up to a monolayer of metal on a foreign substrate at potentials positive to the reversible thermodynamic potential, facilitates this type of surface modification, which can be performed repeatedly by potential control. Recent studies of these surfaces and their catalytic properties by new in situ surface structure sensitive techniques have greatly improved the understanding of these systems.

Reaction factors for photo-electrochemical deposition of metal silver on polypyrrole as conducting polymer

International Nuclear Information System (INIS)

Kawakita, Jin; Boter, Jelmer M.; Shova, Neupane; Fujihira, Hiroshi; Chikyow, Toyohiro

2015-01-01

Composite of metal and conducting polymer is expected for electrical application by the use of their advantages. For improvement of the composite’s characteristics, it is important to control formation rate and structure of the composites obtained by simultaneous metal deposition and polymerization under photo irradiation. The purpose of this research was to reveal the effects of UV irradiation and dopant type for conducting polymer on photo-electrochemical deposition of metal. Cathodic polarization curves for silver deposition on polypyrrole doped with different types of anion at different intensity of the UV light were compared. Deposited particles were evaluated by the statistical analysis. The experimental results showed that silver deposition on polypyrrole was enhanced by UV introduction and depended on the dopant type.

Inorganic-Organic Coating via Molecular Layer Deposition Enables Long Life Sodium Metal Anode.

Science.gov (United States)

Zhao, Yang; Goncharova, Lyudmila V; Zhang, Qian; Kaghazchi, Payam; Sun, Qian; Lushington, Andrew; Wang, Biqiong; Li, Ruying; Sun, Xueliang

2017-09-13

Metallic Na anode is considered as a promising alternative candidate for Na ion batteries (NIBs) and Na metal batteries (NMBs) due to its high specific capacity, and low potential. However, the unstable solid electrolyte interphase layer caused by serious corrosion and reaction in electrolyte will lead to big challenges, including dendrite growth, low Coulombic efficiency and even safety issues. In this paper, we first demonstrate the inorganic-organic coating via advanced molecular layer deposition (alucone) as a protective layer for metallic Na anode. By protecting Na anode with controllable alucone layer, the dendrites and mossy Na formation have been effectively suppressed and the lifetime has been significantly improved. Moreover, the molecular layer deposition alucone coating shows better performances than the atomic layer deposition Al 2 O 3 coating. The novel design of molecular layer deposition protected Na metal anode may bring in new opportunities to the realization of the next-generation high energy-density NIBs and NMBs.

Benefits of carbon addition on the hydrogen absorption properties of Mg-based thin films grown by Pulsed Laser Deposition

International Nuclear Information System (INIS)

Darok, X.; Rougier, A.; Bhat, V.; Aymard, L.; Dupont, L.; Laffont, L.; Tarascon, J.-M.

2006-01-01

Mg-Ni thin films were grown using Pulsed Laser Deposition. In situ optical changes from shiny metallic to transparent states were observed for films deposited in vacuum and under an Ar/H 2 gas mixture (93/7%), respectively. Optical changes were also achieved by ex situ hydrogenation under hydrogen gas pressure of 15 bars at 200 deg. C. However, after ex situ hydrogenation, the optical transmittance of the Mg-based hydrogenated thin films did not exceed 25%. Such limitation was attributed to oxygen contamination, as deduced by High Resolution Transmission Electron Microscopy observations, showing the co-existence of both Mg-based and MgO phases for as-deposited films. A significant decrease in oxygen contamination was successfully achieved with the addition of carbon, leading to the preparation of (Mg-based)-C x (x < 20%) thin films showing a faster and easier hydrogenation

Vapor deposition of large area NpO2 and UO2 deposits

International Nuclear Information System (INIS)

Adair, H.L.; Gibson, J.R.; Kobisk, E.H.; Dailey, J.M.

1976-01-01

Deposition of NpO 2 and UO 2 thin films over an area of 7.5 to 10 cm diam has become a routine operation in preparation of fission chamber plates. Vacuum evaporation or electroplating has been used for this purpose. The ''paint brush'' technique has been used as well; however, uniformity requirements normally eliminate this procedure. Vapor deposition in vacuum appears to be the most suitable technique for preparing NpO 2 and UO 2 deposits of >200 cm 2 . This paper describes the procedures used in preparing uniform large area deposits of NpO 2 (approximately 300 cm 2 ) and UO 2 (approximately 2000 cm 2 ) by vacuum evaporation using electron bombardment heating and several substrate motion and heating methods to achieve uniformity and adhesion

Material-controlled dynamic vacuum insulation

Science.gov (United States)

Benson, D.K.; Potter, T.F.

1996-10-08

A compact vacuum insulation panel is described comprising a chamber enclosed by two sheets of metal, glass-like spaces disposed in the chamber between the sidewalls, and a high-grade vacuum in the chamber includes apparatus and methods for enabling and disabling, or turning ``on`` and ``off`` the thermal insulating capability of the panel. One type of enabling and disabling apparatus and method includes a metal hydride for releasing hydrogen gas into the chamber in response to heat, and a hydrogen grate between the metal hydride and the chamber for selectively preventing and allowing return of the hydrogen gas to the metal hydride. Another type of enabling and disabling apparatus and method includes a variable emissivity coating on the sheets of metal in which the emissivity is controllably variable by heat or electricity. Still another type of enabling and disabling apparatus and method includes metal-to-metal contact devices that can be actuated to establish or break metal-to-metal heat paths or thermal short circuits between the metal sidewalls. 25 figs.

Radiation-controlled dynamic vacuum insulation

Science.gov (United States)

Benson, D.K.; Potter, T.F.

1995-07-18

A compact vacuum insulation panel is described comprising a chamber enclosed by two sheets of metal, glass-like spaces disposed in the chamber between the sidewalls, and a high-grade vacuum in the chamber that includes apparatus and methods for enabling and disabling, or turning ``on`` and ``off`` the thermal insulating capability of the panel. One type of enabling and disabling apparatus and method includes a metal hydride for releasing hydrogen gas into the chamber in response to heat, and a hydrogen grate between the metal hydride and the chamber for selectively preventing and allowing return of the hydrogen gas to the metal hydride. Another type of enabling and disabling apparatus and method includes a variable emissivity coating on the sheets of metal in which the emissivity is controllably variable by heat or electricity. Still another type of enabling and disabling apparatus and method includes metal-to-metal contact devices that can be actuated to establish or break metal-to-metal heat paths or thermal short circuits between the metal sidewalls. 25 figs.

The mechanism of liquid metal jet formation in the cathode spot of vacuum arc discharge

Science.gov (United States)

Gashkov, M. A.; Zubarev, N. M.; Mesyats, G. A.; Uimanov, I. V.

2016-08-01

We have theoretically studied the dynamics of molten metal during crater formation in the cathode spot of vacuum arc discharge. At the initial stage, a liquid-metal ridge is formed around the crater. This process has been numerically simulated in the framework of the two-dimensional axisymmetric heat and mass transfer problem in the approximation of viscous incompressible liquid. At a more developed stage, the motion of liquid metal loses axial symmetry, which corresponds to a tendency toward jet formation. The development of azimuthal instabilities of the ridge is analyzed in terms of dispersion relations for surface waves. It is shown that maximum increments correspond to instability of the Rayleigh-Plateau type. Estimations of the time of formation of liquid metal jets and their probable number are obtained.

Flood deposits and their heavy metal load - example of the Neckar river

International Nuclear Information System (INIS)

Hellmann, H.

1993-01-01

Flood deposits may develop from suspended solids under certain conditions, e.g. after the passage of a flood wave. Depending on the origin of the suspended material, the heavy metal load in these deposits varies considerably. Recent sediments deposited in the Neckar waterway after the flood of February/March 1990 are taken as an example to explain that it is necessary to consider the contamination load in relation to the grain size of the material. To this end, the heavy metal contents of the fine grain fraction (grain diameter [de

Salt Removal from the Uranium Deposits of Electrorefiner

Energy Technology Data Exchange (ETDEWEB)

Kwon, S. W.; Park, K. M.; Lee, S. J.; Park, S. B.; Cho, C. H.; Choi, S. Y.; Lee, H. S.; Kim, J. G. [Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of)

2010-10-15

Electrorefining is a key step in pyroprocessing. The electrorefining process is generally composed of two recovery steps. The deposit of uranium onto a solid cathode and the recovery of the remaining uranium and TRU elements simultaneously by a liquid cadmium cathode. The solid cathode processing is necessary to separate the salt from the cathode since the uranium deposit in a solid cathode contains electrolyte salt. In the liquid cathode, cadmium metal should be removed to recover actinide product. A physical separation process, such as distillation separation, is more attractive than a chemical or dissolution process because physical processes generate much less secondary process. Distillation process was employed for the cathode processing due to the advantages of minimal generation of secondary waste, compact unit process, simple and low cost equipment. The basis for vacuum distillation separation is the difference in vapor pressures between salt and uranium. A solid cathode deposit is heated in a heating region and salt vaporizes, while non volatile uranium remains behind. It is very important to increase the throughput of the salt separation system due to the high uranium content of spent nuclear fuel and high salt fraction of uranium dendrites. The evaporation rate of the LiCl-KCl eutectic salt in vacuum distiller is not so high to come up with the generation capacity of uranium dendrites in electro-refiner. Therefore, wide evaporation area or high distillation temperature is necessary for the successful salt separation. In this study, the solid-liquid separation was proposed prior to distillation of salt and a feasibility of the separation of the liquid salt by a metallic wire mesh (sieve) was tested for the reduction of the burden of the following vacuum distillation process

Salt Removal from the Uranium Deposits of Electrorefiner

International Nuclear Information System (INIS)

Kwon, S. W.; Park, K. M.; Lee, S. J.; Park, S. B.; Cho, C. H.; Choi, S. Y.; Lee, H. S.; Kim, J. G.

2010-01-01

Electrorefining is a key step in pyroprocessing. The electrorefining process is generally composed of two recovery steps. The deposit of uranium onto a solid cathode and the recovery of the remaining uranium and TRU elements simultaneously by a liquid cadmium cathode. The solid cathode processing is necessary to separate the salt from the cathode since the uranium deposit in a solid cathode contains electrolyte salt. In the liquid cathode, cadmium metal should be removed to recover actinide product. A physical separation process, such as distillation separation, is more attractive than a chemical or dissolution process because physical processes generate much less secondary process. Distillation process was employed for the cathode processing due to the advantages of minimal generation of secondary waste, compact unit process, simple and low cost equipment. The basis for vacuum distillation separation is the difference in vapor pressures between salt and uranium. A solid cathode deposit is heated in a heating region and salt vaporizes, while non volatile uranium remains behind. It is very important to increase the throughput of the salt separation system due to the high uranium content of spent nuclear fuel and high salt fraction of uranium dendrites. The evaporation rate of the LiCl-KCl eutectic salt in vacuum distiller is not so high to come up with the generation capacity of uranium dendrites in electro-refiner. Therefore, wide evaporation area or high distillation temperature is necessary for the successful salt separation. In this study, the solid-liquid separation was proposed prior to distillation of salt and a feasibility of the separation of the liquid salt by a metallic wire mesh (sieve) was tested for the reduction of the burden of the following vacuum distillation process

Development of a Methodology for Conducting Hall Thruster EMI Tests in Metal Vacuum Chambers of Arbitrary Shape and Size

Science.gov (United States)

Gallimore, Alec D.

2000-01-01

While the closed-drift Hall thruster (CDT) offers significant improvement in performance over conventional chemical rockets and other advanced propulsion systems such as the arcjet, its potential impact on spacecraft communication signals must be carefully assessed before widespread use of this device can take place. To this end, many of the potentially unique issues that are associated with these thrusters center on its plume plasma characteristics and the its interaction with electromagnetic waves. Although a great deal of experiments have been made in characterizing the electromagnetic interference (EMI) potential of these thrusters, the interpretation of the resulting data is difficult because most of these measurements have been made in vacuum chambers with metal walls which reflect radio waves emanating from the thruster. This project developed a means of assessing the impact of metal vacuum chambers of arbitrary size or shape on EMI experiments, thereby allowing for test results to be interpreted properly. Chamber calibration techniques were developed and initially tested at RIAME using their vacuum chamber. Calibration experiments were to have been made at Tank 5 of NASA GRC and the 6 m by 9 m vacuum chamber at the University of Michigan to test the new procedure, however the subcontract to RIAME was cancelled by NASA memorandum on Feb. 26. 1999.

Influence of air and vacuum environment on fatigue behavior of Zr-based bulk metallic glasses

International Nuclear Information System (INIS)

Wang, G.Y.; Liaw, P.K.; Yokoyama, Y.; Peter, W.H.; Yang, B.; Freels, M.; Buchanan, R.A.; Liu, C.T.; Brooks, C.R.

2007-01-01

High-cycle fatigue (HCF) experiments in air and vacuum at room temperature were conducted on zirconium (Zr)-based bulk-metallic glasses (BMGs): Zr 50 Cu 40 Al 10 , Zr 50 Cu 30 Al 10 Ni 10 , and Zr 50 Cu 37 Al 10 Pd 3 in atomic percent. The fatigue-endurance limit of Zr 50 Cu 37 Al 10 Pd 3 was found to be significantly greater than those of Zr 50 Cu 40 Al 10 and Zr 50 Cu 30 Al 10 Ni 10 , which indicates that the inclusions of Pd and the resulting nano structures improve the fatigue resistances of the Zr-based BMGs. The fatigue lives in vacuum and air were generally found to be comparable

Compact vacuum insulation

Science.gov (United States)

Benson, D.K.; Potter, T.F.

1993-01-05

An ultra-thin compact vacuum insulation panel is comprised of two hard, but bendable metal wall sheets closely spaced apart from each other and welded around the edges to enclose a vacuum chamber. Glass or ceramic spacers hold the wall sheets apart. The spacers can be discrete spherical beads or monolithic sheets of glass or ceramic webs with nodules protruding therefrom to form essentially point'' or line'' contacts with the metal wall sheets. In the case of monolithic spacers that form line'' contacts, two such spacers with the line contacts running perpendicular to each other form effectively point'' contacts at the intersections. Corrugations accommodate bending and expansion, tubular insulated pipes and conduits, and preferred applications are also included.

Protective and decorative coatings produced by ion-plasma deposition

International Nuclear Information System (INIS)

Radjabov, T.D.; Kamardin, A.I.; Pulatov, S.U.

1996-01-01

Vacuum device is worked out for the vacuum low temperature deposition of protective and decorative films and studied technical regimes of obtaining such films to target from the metal,plastics, ceramic and glass with thickness up to 10 mkm and square 1 m 2 /cycle. Vacuum device provide possibility to create films by means of magnetron with pressure 100-10 1 Pa to different targets and to conduct preliminary treatment of them by argon ion beam with 3-4 keV energy for the cleaning of surface. Protective films of Chrome, Titanium, Nitride of Titanium and stainless steel have shown high adhesion properties up to 300-400 kgs/sm and ensure stable protection of surface from air and chemical corrosion. Obtained films has good decorative and colour characteristics. (author). 2 figs

[Pollution Evaluation and Risk Assessment of Heavy Metals from Atmospheric Deposition in the Parks of Nanjing].

Science.gov (United States)

Wang, Cheng; Qian, Xin; Li, Hui-ming; Sun, Yi-xuan; Wang, Jin-hua

2016-05-15

Contents of heavy metals involving As, Cd, Cr, Cu, Ni, Pb and Zn from atmospheric deposition in 10 parks of Nanjing were analyzed. The pollution level, ecological risk and health risk were evaluated using Geoaccumulation Index, Potential Ecological Risk Index and the US EPA Health Risk Assessment Model, respectively. The results showed that the pollution levels of heavy metals in Swallow Rock Park, Swallow Rock Park and Mochou Lake Park were higher than the others. Compared to other cities such as Changchun, Wuhan and Beijing, the contents of heavy metals in atmospheric deposition of parks in Nanjing were higher. The evaluation results of Geoaccumulation Index showed that Pb was at moderate pollution level, Zn and Cu were between moderate and serious levels, while Cd was between serious and extreme levels. The ecological risk level of Cd was high. The assessment results of Health Risk Assessment Model indicated that there was no non-carcinogenic risk for all the seven heavy metals. For carcinogenic risk, the risks of Cd, Cr and Ni were all negligible (Risk < 1 x 10⁻⁶), whereas As had carcinogenic risk possibility but was considered to be acceptable (10⁻⁶ < Risk < 10⁻⁴).

Computing atmospheric transport and deposition of heavy metals over Europe: country budgets for 1985

International Nuclear Information System (INIS)

Bartnicki, J.

1996-01-01

The Heavy Metal Eulerian Transport (HMET) model has been used to calculate the exchange of As, Cd, Pb and Zn between European countries in 1985. The model was run separately for each emitter country and the computed deposition field used to calculate the contribution of the emitter to each receptor country. The results of these computations are presented in the form of a country budget matrix for each metal. Accuracy of such computations depends on the size and linearity of the numerical method applied to the transport equation. Exchange of heavy metals due to atmospheric transport over Europe is significant. 30% to 90% of the heavy metals emitted from each country is deposited in other countries. The remaining mass is deposited in European seas, Atlantic Ocean and transported outside the model domain. The largest part of the emission from each country is deposited in the same country. The next largest fraction is transported to the nearest neighbours. A significant long range transport of heavy metals is to the Soviet Union. This is partly justified by the size and location of this receptor country, as well as the prevailing meteorological conditions in Europe. However, this large transport to USSR is slightly overestimated due to some artificial properties of the numerical method applied to basic model equations. Export versus import and emission versus deposition of metals were analyzed for each country. The largest positive difference between export and import was found for Poland, Germany and Yugoslavia (As, Cd and Zn), and United Kingdom, Italy and Belgium (Pb). The Soviet Union and Czechoslovakia are the countries where import of all metals is significantly larger than export. The Soviet Union has much higher emissions than deposition of all metals compared to other European countries. 38 refs., 5 figs., 13 tabs

Superconductivity, magnetics, cryogenics, and vacuum coating

International Nuclear Information System (INIS)

Akin, J.E.; Ballou, J.K.; Beaver, R.J.

1975-01-01

The Engineering Sciences Department continued to provide consultation, design, and experiment to support the plasma physics activities of the Division while inaugurating a comprehensive program to develop superconducting magnets for toroidal fusion devices. This newly funded program is aimed at producing toroidal superconducting magnets for an experimental power reactor by the mid 1980's. Other superconducting work, such as the 14-T niobium tin solenoid designed last year for use in Moessbauer experiments, has been fabricated, successfully tested, and delivered to the Physics Division. This coil, which used a 1.27-cm wide Nb 3 Sn conductor operating at 14 T with a coil current density of 11,000 A/cm, represents an advance in the state-of-the-art. The conceptual design was provided for a subcooler to extend the ORMAK operating temperature to 70 0 K and thus allow operation at fields up to 25 kG with the present generators. The detailed design, fabrication, installation supervision, and acceptance testing of the subcooler were provided by the UCCND engineering organization. Further support to the ORMAK program was provided by the vacuum-coating activity through an investigation of sputtering erosion of the ORMAK liner. In addition, a program was undertaken to develop a variety of refractory surfaces of metals, alloys, and intermetallic compounds on stainless steel for use as first walls in future fusion devices. Adherent thick-film metallic and compound coatings deposited in vacuum by several mechanisms were produced and tested. (U.S.)

Plating on difficult-to-plate metals: what's new

International Nuclear Information System (INIS)

Wiesner, H.J.

1980-01-01

Some of the changes since 1970 in procedures for plating on such materials as titanium, molybdenum, silicon, aluminum, and gallium arsenide are summarized. While basic procedures for plating some of these materials were developed as many as 30 to 40 years ago, changes in the end uses of the plated products have necessitated new plating processes. In some cases, vacuum techniques - such as ion bombardment, ion implantation, and vacuum metallization - have been introduced to improve the adhesion of electrodeposits. In other cases, these techniques have been used to deposit materials upon which electrodeposits are required

Tuning the architectures of lead deposits on metal substrates by electrodeposition

International Nuclear Information System (INIS)

Yao Chenzhong; Liu Meng; Zhang Peng; He Xiaohui; Li Gaoren; Zhao Wenxia; Liu Peng; Tong Yexiang

2008-01-01

Different morphologies of lead (Pb) deposited on different metal substrates have been prepared via electrochemical deposition in aqueous solution. The morphologies of as-deposited lead were determined by scanning electron microscope (SEM). It is found that the various morphologies of the products are dependent on the electrodeposition conditions, including the deposition current densities, concentration of additives, substrates and deposition time. X-ray diffraction (XRD) and transmission electron microscope (TEM) results reveal that all these lead deposits with different morphologies can be assigned to the space group Fm-3m (2 2 5)

Structure, phase composition and microhardness of vacuum-arc multilayered Ti/Al, Ti/Cu, Ti/Fe, Ti/Zr nano-structures with different periods

Energy Technology Data Exchange (ETDEWEB)

Demchishin, A.V., E-mail: ademch@meta.ua [Institute of Problems in Material Science, NASU, Kiev (Ukraine); Gnilitskyi, I., E-mail: iaroslav.gnilitskyi@unimore.it [DISMI – Department of Sciences and Methods for Engineering, University of Modena and Reggio Emilia, Reggio Emilia (Italy); Orazi, L., E-mail: leonardo.orazi@unimore.it [DISMI – Department of Sciences and Methods for Engineering, University of Modena and Reggio Emilia, Reggio Emilia (Italy); Ascari, A., E-mail: a.ascari@unibo.it [DIN – Department of Industrial Engineering, University of Bologna, Bologna (Italy)

2015-07-01

Highlights: • Multilayer coatings of Ti/Fe, Ti/Al, Ti/Cu and Ti/Zr are generated. • Microstructure and morphology of the different systems are investigated. • XR diffraction analysis was performed to investigate phases composition. • Effects of inter metallic phases on microhardess are investigated. • Correlations between parameters and layer thickness are outlined. - Abstract: The microstructure, phase composition and microhardness of multilayered Ti/Al, Ti/Cu, Ti/Fe and Ti/Zr condensates produced on stainless steel substrates via vacuum-arc evaporation of pure metals were studied. The sublayer periods (Λ) were regulated in the range 80–850 nm by varying the vacuum discharge current and the duration of the successive depositions of metallic plasma onto the substrates while maintaining the total deposition time constant. The regularity of the obtained nanostructures was investigated by scanning and transmission electron microscopy while phase compositions were identified with X-ray diffraction (XRD) analysis in order to evidence the presence of interdiffusion and the amount of intermetallics. Condensates cross sections were mechanically characterized by means of microhardness tests. Measurements were correlated to the periods and to the presence of intermetallics.

Structure, phase composition and microhardness of vacuum-arc multilayered Ti/Al, Ti/Cu, Ti/Fe, Ti/Zr nano-structures with different periods

International Nuclear Information System (INIS)

Demchishin, A.V.; Gnilitskyi, I.; Orazi, L.; Ascari, A.

2015-01-01

Highlights: • Multilayer coatings of Ti/Fe, Ti/Al, Ti/Cu and Ti/Zr are generated. • Microstructure and morphology of the different systems are investigated. • XR diffraction analysis was performed to investigate phases composition. • Effects of inter metallic phases on microhardess are investigated. • Correlations between parameters and layer thickness are outlined. - Abstract: The microstructure, phase composition and microhardness of multilayered Ti/Al, Ti/Cu, Ti/Fe and Ti/Zr condensates produced on stainless steel substrates via vacuum-arc evaporation of pure metals were studied. The sublayer periods (Λ) were regulated in the range 80–850 nm by varying the vacuum discharge current and the duration of the successive depositions of metallic plasma onto the substrates while maintaining the total deposition time constant. The regularity of the obtained nanostructures was investigated by scanning and transmission electron microscopy while phase compositions were identified with X-ray diffraction (XRD) analysis in order to evidence the presence of interdiffusion and the amount of intermetallics. Condensates cross sections were mechanically characterized by means of microhardness tests. Measurements were correlated to the periods and to the presence of intermetallics

Plasma sprayed and electrospark deposited zirconium metal diffusion barrier coatings

International Nuclear Information System (INIS)

Hollis, Kendall J.; Pena, Maria I.

2010-01-01

Zirconium metal coatings applied by plasma spraying and electrospark deposition (ESD) have been investigated for use as diffusion barrier coatings on low enrichment uranium fuel for research nuclear reactors. The coatings have been applied to both stainless steel as a surrogate and to simulated nuclear fuel uranium-molybdenum alloy substrates. Deposition parameter development accompanied by coating characterization has been performed. The structure of the plasma sprayed coating was shown to vary with transferred arc current during deposition. The structure of ESD coatings was shown to vary with the capacitance of the deposition equipment.

Influence of the sputtering system's vacuum level on the properties of indium tin oxide films

International Nuclear Information System (INIS)

Zebaze Kana, M.G.; Centurioni, E.; Iencinella, D.; Summonte, C.

2006-01-01

The influence of the chamber residual pressure level in the radio frequency magnetron sputtering process on the electrical, optical and structural properties of indium thin oxide (ITO) is investigated. Several ITO films were deposited at various residual pressure levels on Corning glass using In 2 O 3 :SnO 2 target in argon atmosphere and without the addition of oxygen partial pressure. It is found that a very good vacuum is associated to metallic films and results in less transparent ITO films, with some powder formation on the surface. On the contrary highly transparent and conducting films are produced at a higher residual pressure. The best deposition conditions are addressed for ITO films as transparent conducting oxide layers in silicon heterojunction solar cells. Using the optimal vacuum level for ITO fabrication, a maximum short circuit current of 36.6 mA/cm 2 and a fill-factor of 0.78 are obtained for solar cells on textured substrates with a device conversion efficiency of 16.2%

Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO{sub 2} films

Energy Technology Data Exchange (ETDEWEB)

Aramwit, C. [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Intarasiri, S. [Science and Technology Research Institute, Chiang Mai University, Chiang Mai 50200 (Thailand); Thailand Center of Excellence in Physics, Commission on Higher Education, 328 Si Ayutthaya Road, Bangkok 10400 (Thailand); Bootkul, D. [Thailand Center of Excellence in Physics, Commission on Higher Education, 328 Si Ayutthaya Road, Bangkok 10400 (Thailand); Department of General Science, Faculty of Science, Srinakharinwirot University, Bangkok 10110 (Thailand); Tippawan, U. [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Thailand Center of Excellence in Physics, Commission on Higher Education, 328 Si Ayutthaya Road, Bangkok 10400 (Thailand); Supsermpol, B.; Seanphinit, N. [Department of General Science, Faculty of Science, Srinakharinwirot University, Bangkok 10110 (Thailand); Western Digital Thailand Co. Ltd., Ayutthaya 13160 (Thailand); Ruangkul, W. [Thailand Center of Excellence in Physics, Commission on Higher Education, 328 Si Ayutthaya Road, Bangkok 10400 (Thailand); Yu, L.D., E-mail: yuld@thep-center.org [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Thailand Center of Excellence in Physics, Commission on Higher Education, 328 Si Ayutthaya Road, Bangkok 10400 (Thailand)

2014-08-15

Highlights: • Titanium dioxide films were synthesized using the FCVAD technique. • Various FCVAD conditions were tested. • The TiO{sub 2} films were characterized. • The FCVAD condition effects on the film characteristics were studied. • The O{sub 2} pressure had the most important effect on the film quality. - Abstract: Titanium dioxide (TiO{sub 2}) films for photovoltaic applications were synthesized using filtered cathodic vacuum arc deposition (FCVAD) technique. Various deposition conditions were tested for an optimal film formation. The conditions included the oxygen (O{sub 2}) pressure which was varied from a base pressure 10{sup −5} to 10{sup −4}, 10{sup −3}, 10{sup −2} and 10{sup −1} Torr, sample holder bias varied using 0 or −250 V, deposition time varied from 10, 20 to 30 min, and deposition distance varied from 1 to 3 cm. The deposited films were also annealed and compared with unannealed ones. The films under various conditions were characterized using optical microscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM), energy-dispersive X-ray spectroscopy (EDS) and Raman spectroscopy techniques. The film transparency increased and thickness decreased to a nanoscale with increasing of the O{sub 2} pressure. The transparent deposited films contained stoichiometric titanium and oxygen under the medium O{sub 2} pressure. The as-deposited films were TiO{sub 2} containing some rutile but no anatase which needed annealing to form.

Gas phase deposition of oxide and metal-oxide coatings on fuel particles

International Nuclear Information System (INIS)

Patokin, A.P.; Khrebtov, V.L.; Shirokov, B.M.

2008-01-01

Production processes and properties of oxide (Al 2 O 3 , ZrO 2 ) and metal-oxide (Mo-Al 2 O 3 , Mo-ZrO 2 , W-Al 2 O 3 , W-ZrO 2 ) coatings on molybdenum substrates and uranium dioxide fuel particles were investigated. It is shown that the main factors that have an effect on the deposition rate, density, microstructure and other properties of coatings are the deposition temperature, the ratio of H 2 and CO 2 flow rates, the total reactor pressure and the ratio of partial pressures of corresponding metal chlorides during formation of metal-oxide coatings

Heteroepitaxial Growth of Germanium-on-Silicon Using Ultrahigh-Vacuum Chemical Vapor Deposition with RF Plasma Enhancement

Science.gov (United States)

Alharthi, Bader; Grant, Joshua M.; Dou, Wei; Grant, Perry C.; Mosleh, Aboozar; Du, Wei; Mortazavi, Mansour; Li, Baohua; Naseem, Hameed; Yu, Shui-Qing

2018-05-01

Germanium (Ge) films have been grown on silicon (Si) substrate by ultrahigh-vacuum chemical vapor deposition with plasma enhancement (PE). Argon plasma was generated using high-power radiofrequency (50 W) to assist in germane decomposition at low temperature. The growth temperature was varied in the low range of 250°C to 450°C to make this growth process compatible with complementary metal-oxide-semiconductor technology. The material and optical properties of the grown Ge films were investigated. The material quality was determined by Raman and x-ray diffraction techniques, revealing growth of crystalline films in the temperature range of 350°C to 450°C. Photoluminescence spectra revealed improved optical quality at growth temperatures of 400°C and 450°C. Furthermore, material quality study using transmission electron microscopy revealed existence of defects in the Ge layer grown at 400°C. Based on the etch pit density, the average threading dislocation density in the Ge layer obtained at this growth temperature was measured to be 4.5 × 108 cm-2. This result was achieved without any material improvement steps such as use of graded buffer or thermal annealing. Comparison between PE and non-plasma-enhanced growth, in the same machine at otherwise the same growth conditions, indicated increased growth rate and improved material and optical qualities for PE growth.

In Situ Synthesis and Characterization of Fe-Based Metallic Glass Coatings by Electrospark Deposition Technique

Science.gov (United States)

Burkov, Alexander A.; Pyachin, S. A.; Ermakov, M. A.; Syuy, A. V.

2017-02-01

Crystalline FeWMoCrBC electrode materials were prepared by conventional powder metallurgy. Metallic glass (MG) coatings were produced by electrospark deposition onto AISI 1035 steel in argon atmosphere. X-ray diffraction and scanning electron microscopy verified the amorphous structure of the as-deposited coatings. The coatings have a thickness of about 40 microns and a uniform structure. The results of dry sliding wear tests against high-speed steel demonstrated that Fe-based MG coatings had a lower friction coefficient and more than twice the wear resistance for 20 km sliding distance with respect to AISI 1035 steel. High-temperature oxidation treatment of the metal glass coatings at 1073 K in air for 12 h revealed that the oxidation resistance of the best coating was 36 times higher than that for bare AISI 1035 steel. These findings are expected to broaden the applications of electrospark Fe-based MG as highly protective and anticorrosive coatings for mild steel.

TVA - Thermionic Vacuum Arc - A new type of discharge generating pure metal vapor plasma

International Nuclear Information System (INIS)

Musa, G.; Popescu, A.; Mustata, I.; Borcoman, I.; Cretu, M.; Leu, G.F.; Salambas, A.; Ehrich, H.; Schumann, I.

1996-01-01

In this paper it is presented a new type of discharge in vacuum conditions generating pure metal vapor plasma with energetic metal ions content. The peculiarities of this heated cathode discharge are described and the dependence of the measured ion energy of the working parameters are established. The ion energy value can be easily and smoothly changed. A nearly linear dependence between energy of ions and arc voltage drop has been observed. The ion energy can be increased by the increase of the interelectrode distance, decrease of cathode temperature, change of the relative position of the electrodes and by the decrease of the arc discharge current. A special configuration with cylindrical geometry has been used to develop a small size and compact metal vapour plasma gun. Due to the mentioned peculiarities, this discharge offers new openings for important applications. (author)

Monitoring of the Deposition of PAHs and Metals Produced by a Steel Plant in Taranto (Italy

Directory of Open Access Journals (Sweden)

M. Amodio

2014-01-01

Full Text Available A high time-resolved monitoring campaign of bulk deposition of PAHs and metals was conducted near the industrial area and at an urban background site in province of Taranto (Italy in order to evaluate the impact of the biggest European steel plant. The deposition fluxes of the sum of detected PAHs at the industrial area ranged from 92 to 2432 ng m−2d−1. In particular the deposition fluxes of BaP, BaA, and BkF were, on average, 10, 14, and 8 times higher than those detected at the urban background site, respectively. The same finding was for metals. The deposition fluxes of Ni (19.8 µg m−2 d−1 and As (2.2 µg m−2 d−1 at the industrial site were about 5 times higher than those at the urban background site, while the deposition fluxes of Fe (57 mg m−2d−1 and Mn (1.02 mg m−2d−1 about 31 times higher. Precipitation and wind speed played an important role in PAH deposition fluxes. Fe and Mn fluxes at the industrial site resulted high when wind direction favored the transport of air masses from the steel plant to the receptor site. The impact of the industrial area was also confirmed by IP/(IP + BgP, IP/BgP, and BaP/BgP diagnostic ratios.

Design of the ITER vacuum vessel

International Nuclear Information System (INIS)

Ioki, K.; Johnson, G.; Shimizu, K.; Williamson, D.

1995-01-01

The ITER vacuum vessel is a major safety barrier and must support electromagnetic loads during plasma disruptions and vertical displacement events (VDE) and withstand plausible accidents without losing confinement.The vacuum vessel has a double wall structure to provide structural and electrical continuity in the toroidal direction. The inner and outer shells and poloidal stiffening ribs between them are joined by welding, which gives the vessel the required mechanical strength. The space between the shells will be filled with steel balls and plate inserts to provide additional nuclear shielding. Water flowing in this space is required to remove nuclear heat deposition, which is 0.2-2.5% of the total fusion power. The minor and major radii of the tokamak are 3.9 m and 13 m respectively, and the overall height is 15 m. The total thickness of the vessel wall structure is 0.4-0.7 m.The inboard and outboard blanket segments are supported from the vacuum vessel. The support structure is required to withstand a large total vertical force of 200-300 MN due to VDE and to allow for differential thermal expansion.The first candidate for the vacuum vessel material is Inconel 625, due to its higher electric resistivity and higher yield strength, even at high temperatures. Type 316 stainless steel is also considered a vacuum vessel material candidate, owing to its large database and because it is supported by more conventional fabrication technology. (orig.)

Metal nanoparticle direct inkjet printing for low-temperature 3D micro metal structure fabrication

International Nuclear Information System (INIS)

Ko, Seung Hwan; Nam, Koo Hyun; Chung, Jaewon; Hotz, Nico; Grigoropoulos, Costas P

2010-01-01

Inkjet printing of functional materials is a key technology toward ultra-low-cost, large-area electronics. We demonstrate low-temperature 3D micro metal structure fabrication by direct inkjet printing of metal nanoparticles (NPs) as a versatile, direct 3D metal structuring approach representing an alternative to conventional vacuum deposition and photolithographic methods. Metal NP ink was inkjet-printed to exploit the large melting temperature drop of the nanomaterial and the ease of the NP ink formulation. Parametric studies on the basic conditions for stable 3D inkjet printing of NP ink were carried out. Furthermore, diverse 3D metal microstructures, including micro metal pillar arrays, helices, zigzag and micro bridges were demonstrated and electrical characterization was performed. Since the process requires low temperature, it carries substantial potential for fabrication of electronics on a plastic substrate

Effects of vacuum and ageing on Zr4/Cr3 based conversion coatings on aluminium alloys

Science.gov (United States)

Thirupathi, Kalaivanan; Bárczy, Pál; Vad, Kálmán; Csik, Attila; Somosvári, Béla Márton

2018-05-01

In this study, we investigate the impact of ageing and high vacuum on existing environmentally friendly Zr4/Cr3-based conversion coatings. The freshly formed coating undergoes several changes during ageing and exposure to high vacuum. Based on the present data, we propose that the coating formed over AA6082 and AA7075 alloys is sol-gel in nature, confirmed by secondary neutral mass spectroscopy (SNMS) using the depth profiling technique. Our findings reveal that there are elemental level changes that result in shrinkage of the coating. Most Zr ions in the coating are in the solute form, with lesser number of Cr and Al ions that disappear under high vacuum over a certain period of time. The remaining Cr, Zr and O atoms exist in a gelatinous state. During ageing, there is a continuous transition of ions from solute to gelatinous state. In addition, the deposition of coating ions is directly influenced by the substrates and their constituents. The extent of dissolution of aluminium in the conversion bath determines both Zr and Cr ion deposition. For a highly alloyed metal like AA7075, the dissolution rate is disturbed by copper and zinc.

Experimental Test Of Whether Electrostatically Charged Micro-organisms And Their Spores Contribute To The Onset Of Arcs Across Vacuum Gaps

Energy Technology Data Exchange (ETDEWEB)

none,; Grisham, Larry R.

2014-02-24

Recently it was proposed [L.R. Grisham, A. vonHalle, A.F. Carpe, Guy Rossi, K.R. Gilton, E.D. McBride, E.P. Gilson, A. Stepanov, T.N. Stevenson, Physics of Plasma 19 023107 (2012)] that one of the initiators of vacuum voltage breakdown between condu cting electrodes might be micro-organisms and their spores, previously deposited during exposure to air, which tnen become electrostatically charged when an electric potential is applied across the vacuum gap. The note describes a simple experiment to compare the number of voltage-conditioning pulses required to reach the nominal maxium operating voltage across a gap between two metallic conductors in a vacuum, comparing cases in which biological cleaning was done just prior to pump-down with cases where this was not done, with each preceded by exposure to ambient air for three days. Based upon these results, it does not appear that air-deposited microbes and their spores constitute a major pathway for arc initiation, at least for exposure periods of a few days, and for vacuum gaps of a few millimeters, in the regime where voltage holding is usually observed to vary linearly with gap distance

Homostructured ZnO-based metal-oxide-semiconductor field-effect transistors deposited at low temperature by vapor cooling condensation system

Energy Technology Data Exchange (ETDEWEB)

Lin, Tzu-Shun [Institute of Nanotechnology and Microsystems Engineering, National Cheng Kung University, 701 Tainan, Taiwan, ROC (China); Lee, Ching-Ting, E-mail: ctlee@ee.ncku.edu.tw [Institute of Nanotechnology and Microsystems Engineering, National Cheng Kung University, 701 Tainan, Taiwan, ROC (China); Institute of Microelectronics, Department of Electrical Engineering, Advanced Optoelectronic Technology Center, National Cheng Kung University, 701 Tainan, Taiwan, ROC (China)

2015-11-01

Highlights: • The vapor cooling condensation system was designed and used to deposit homostructured ZnO-based metal-oxide-semiconductor field-effect transistors. • The resulting homostructured ZnO-based MOSFETs operated at a reverse voltage of −6 V had a very low gate leakage current of 24 nA. • The associated I{sub DSS} and the g{sub m(max)} were 5.64 mA/mm and 1.31 mS/mm, respectively. - Abstract: The vapor cooling condensation system was designed and used to deposit homostructured ZnO-based metal-oxide-semiconductor field-effect transistors (MOSFETs) on sapphire substrates. Owing to the high quality of the deposited, various ZnO films and interfaces, the resulting MOSFETs manifested attractive characteristics, such as the low gate leakage current of 24 nA, the low average interface state density of 2.92 × 10{sup 11} cm{sup −2} eV{sup −1}, and the complete pinch-off performance. The saturation drain–source current, the maximum transconductance, and the gate voltage swing of the resulting homostructured ZnO-based MOSFETs were 5.64 mA/mm, 1.31 mS/mm, and 3.2 V, respectively.

Vacuum Arc Ion Sources

CERN Document Server

Brown, I.

2013-12-16

The vacuum arc ion source has evolved into a more or less standard laboratory tool for the production of high-current beams of metal ions, and is now used in a number of different embodiments at many laboratories around the world. Applications include primarily ion implantation for material surface modification research, and good performance has been obtained for the injection of high-current beams of heavy-metal ions, in particular uranium, into particle accelerators. As the use of the source has grown, so also have the operational characteristics been improved in a variety of different ways. Here we review the principles, design, and performance of vacuum arc ion sources.

Effect of PbI2 deposition rate on two-step PVD/CVD all-vacuum prepared perovskite

International Nuclear Information System (INIS)

Ioakeimidis, Apostolos; Christodoulou, Christos; Lux-Steiner, Martha; Fostiropoulos, Konstantinos

2016-01-01

In this work we fabricate all-vacuum processed methyl ammonium lead halide perovskite by a sequence of physical vapour deposition of PbI 2 and chemical vapour deposition (CVD) of CH 3 NH 3 I under a static atmosphere. We demonstrate that for higher deposition rate the (001) planes of PbI 2 film show a higher degree of alignment parallel to the sample's surface. From X-ray diffraction data of the resulted perovskite film we derive that the intercalation rate of CH 3 NH 3 I is fostered for PbI 2 films with higher degree of (001) planes alignment. The stoichiometry of the produced perovskite film is also studied by Hard X-ray photoelectron spectroscopy measurements. Complete all-vacuum perovskite solar cells were fabricated on glass/ITO substrates coated by an ultra-thin (5 nm) Zn-phthalocyanine film as hole selective layer. A dependence of residual PbI 2 on the solar cells performance is displayed, while photovoltaic devices with efficiency up to η=11.6% were achieved. - Graphical abstract: A two-step PVD/CVD processed perovskite film with the CVD intercalation rate of CH 3 NCH 3 molecules been fostered by increasing the PVD rate of PbI 2 and prolonging the CVD time. - Highlights: • A simple PVD/CVD process for perovskite film production. • Increased PVD rate yields better alignment of the PbI 2 (001) crystallite planes. • CH 3 NH 3 I intercalation process fostered by increased PbI 2 PVD rate. • Stoichiometric CH 3 NH 3 PbI 3 suitable as absorber in photovoltaic applications • Reduced PbI 2 residue at the bottom of CH 3 NH 3 PbI 3 improves device performance.

Low-cost fabrication of WO{sub 3} films using a room temperature and low-vacuum air-spray based deposition system for inorganic electrochromic device applications

Energy Technology Data Exchange (ETDEWEB)

Park, Sung-Ik [Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul (Korea, Republic of); Kim, Sooyeun, E-mail: sooyeunk@u.washington.edu [Department of Mechanical Engineering, University of Washington, Seattle, WA (United States); Choi, Jung-Oh; Song, Ji-Hyeon [Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul (Korea, Republic of); Taya, Minoru [Department of Mechanical Engineering, University of Washington, Seattle, WA (United States); Ahn, Sung-Hoon, E-mail: ahnsh@snu.ac.kr [Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul (Korea, Republic of); Institute of Advanced Machines and Design, Seoul (Korea, Republic of)

2015-08-31

We report the deposition of tungsten oxide (WO{sub 3}) thin films on fluorine-doped tin oxide (FTO) and indium-doped tin oxide (ITO) glass substrates by using a room-temperature deposition system based on low-vacuum air-spray for the fabrication of inorganic electrochromic windows. The structure of the WO{sub 3} films was characterized using X-ray diffraction, and the surface morphology and film thickness were investigated using scanning electron microscopy and atomic force microscopy. The color of the prepared WO{sub 3} films changed from slight yellow to dark blue under applied voltages, demonstrating electrochromism. The WO{sub 3} film coated FTO glass exhibited a large electrochromic contrast of up to 50% at a wavelength of 800 nm. The electrochemical properties of the films were examined using cyclic voltammetry and chronocoulometry. - Highlights: • WO{sub 3} thin films were fabricated using an air-spray based deposition system at room temperature under low-vacuum conditions. • Dry WO{sub 3} particles were directly deposited on FTO and ITO glasses by using a low-cost deposition system. • The FTO glass based WO{sub 3} film showed the optical contrast of 50% at a wavelength of 800 nm.

Vacuum-annealing induced enhancements in the transparent conducting properties of Mo  +  F doped ZnO thin films

Science.gov (United States)

Dineshbabu, N.; Ravichandran, K.

2017-09-01

The decisive aim of the present study is to enhance the transparent conducting properties of Mo  +  F co-doped ZnO films through annealing. In this work, Mo  +  F co-doped ZnO (MFZO) films were deposited on glass substrates at a deposition temperature of 350 °C using a home-made nebulizer spray pyrolysis technique and the prepared samples were annealed under air and vacuum atmosphere at 400 °C for 2 h. The structural, electrical, optical, surface morphological and elemental properties of as-deposited, air-annealed and vacuum-annealed samples were compared using various analytical techniques. The vacuum-annealed sample shows lowest resistivity of 1.364  ×  10-3 Ω cm and high transmittance of 90% in the visible region with high ohmic conducting nature. The optical bandgap of the sample was found to be increased to 3.36 eV after vacuum annealing treatment. The XRD patterns of the films confirmed the polycrystalline nature. The PL measurements show the defect levels of the deposited films. The FESEM and AFM studies show an increase in the grain size and roughness of the films, respectively, after vacuum-annealing treatment. The presence of the elements before and after annealing treatment was confirmed using XPS analysis.

Effects of deposition of heavy-metal-polluted harbor mud on microbial diversity and metal resistance in sandy marine sediments

DEFF Research Database (Denmark)

Toes, Ann-Charlotte M; Finke, Niko; Kuenen, J Gijs

2008-01-01

Deposition of dredged harbor sediments in relatively undisturbed ecosystems is often considered a viable option for confinement of pollutants and possible natural attenuation. This study investigated the effects of deposition of heavy-metal-polluted sludge on the microbial diversity of sandy...... the finding that some groups of clones were shared between the metal-impacted sandy sediment and the harbor control, comparative analyses showed that the two sediments were significantly different in community composition. Consequences of redeposition of metal-polluted sediment were primarily underlined...... with cultivation-dependent techniques. Toxicity tests showed that the percentage of Cd- and Cu-tolerant aerobic heterotrophs was highest among isolates from the sandy sediment with metal-polluted mud on top....

A metal foil vacuum pump for the fuel cycle of fusion power plants

Energy Technology Data Exchange (ETDEWEB)

Giegerich, Thomas; Day, Christian [Karlsruher Institut fuer Technologie (KIT), Institut fuer Technische Physik (ITEP), Eggenstein-Leopoldshafen (Germany)

2013-07-01

At KIT Karlsruhe, a new vacuum pump based on the physical principle of superpermeation is under development. This metal foil pump shall be used in the fuel cycle of a fusion reactors and forms the central part of the Direct Internal Recycling concept (DIR), a shortcut between the machine exhaust pumping and the fuelling systems. This vacuum pump simplifies the fusion fuel cycle dramatically and provides two major functions simultaneously: A separating and pumping function. It separates a hydrogen isotopes and impurities containing gas flow sharply into a pure H-isotopes flow that is also being compressed. The remaining impurity enriched gas flow passes the pump without being pumped. For superpermeability, a source of molecular hydrogen is needed. This can be achieved by different methods inside of the pump. Most important are plasma based or hot rod (atomizer) based methods. In this talk, the physical working principle and the modeling of this pump is presented and the development towards a technical separator pumping module is shown up.

Adherence problem for carbon films of up to 0.5 mg/cm2 on vacuum-deposited thick ferromagnetic Gd targets

International Nuclear Information System (INIS)

Maier-Komor, P.; Kruecken, R.; Speidel, K.-H.; Kenn, O.

2004-01-01

For high precision measurements of magnetic moments and reduced transition probabilities by the combined technique of projectile Coulomb excitation in inverse kinematics and transient magnetic fields sandwich targets of carbon and gadolinium were required. First preparations revealed a lack of adhesion between the Gd film and the vacuum-deposited C layer. Either the adhesion was generally poor or good results could not be reproduced. Now on a 4 mg/cm 2 Gd target 0.5 mg/cm 2 of nat C should be deposited. The Gd was deposited on 1-1.6 mg/cm 2 Ta backings and Cu films of 3.5-7 mg/cm 2 were deposited on the reverse side of the Ta backings. The adhesive properties of evaporated carbon on ferromagnetic gadolinium were investigated. For this either substrate cooling or the deposition of a 5 μg/cm 2 Ti film as adhesion agent were applied

The interaction of fingermark deposits on metal surfaces and potential ways for visualisation.

Science.gov (United States)

Wightman, G; Emery, F; Austin, C; Andersson, I; Harcus, L; Arju, G; Steven, C

2015-04-01

The interaction of fingermark deposits on metals has been examined by a variety of techniques. Visualisation by film growth has been the main area of investigation through: thermal oxidation, anodising, peroxide solution, and the interaction with vapour of iodine and ammonium sulphide. Corrosion of the underlying metal has also been examined as an alternative means of visualisation. Confocal microscopy was used to look at the film thickness and corrosion products around the prints. Scanning electron microscopy and energy dispersion of X-rays (SEM-EDX) examined a number of metal samples to investigate film growth and the elemental distribution. The observations suggest that differential oxidation was occurring as well as corrosion into the metal. Fingermark deposits on metals can corrode into the metal depending on the reactivity of the metal and leave a recoverable mark. However, fingermark deposits can also alter the rate of chemical reaction of the substrate metal by oxidation. In some cases organic matter can inhibit reaction, both when forming an oxide layer and when corroding the metal. However, signs of third level detail from pore contact may also be visible and the monovalent ions from salts could also influence film growth. Whilst further work would need to be carried out to decide whether any of these techniques may have application in fingermark recovery, this study does suggest that fingermarks on metals may be recoverable after incidents such as fires or immersion in water. Copyright © 2015 Elsevier Ireland Ltd. All rights reserved.

Hole-transport material variation in fully vacuum deposited perovskite solar cells

Energy Technology Data Exchange (ETDEWEB)

Polander, Lauren E.; Pahner, Paul; Schwarze, Martin; Saalfrank, Matthias; Koerner, Christian; Leo, Karl, E-mail: karl.leo@iapp.de [Institut für Angewandte Photophysik, Technische Universität Dresden, 01069 Dresden (Germany)

2014-08-01

This work addresses the effect of energy level alignment between the hole-transporting material and the active layer in vacuum deposited, planar-heterojunction CH{sub 3}NH{sub 3}PbI{sub x−3}Cl{sub x} perovskite solar cells. Through a series of hole-transport materials, with conductivity values set using controlled p-doping of the layer, we correlate their ionization potentials with the open-circuit voltage of the device. With ionization potentials beyond 5.3 eV, a substantial decrease in both current density and voltage is observed, which highlights the delicate energetic balance between driving force for hole-extraction and maximizing the photovoltage. In contrast, when an optimal ionization potential match is found, the open-circuit voltage can be maximized, leading to power conversion efficiencies of up to 10.9%. These values are obtained with hole-transport materials that differ from the commonly used Spiro-MeO-TAD and correspond to a 40% performance increase versus this reference.

Hole-transport material variation in fully vacuum deposited perovskite solar cells

Directory of Open Access Journals (Sweden)

Lauren E. Polander

2014-08-01

Full Text Available This work addresses the effect of energy level alignment between the hole-transporting material and the active layer in vacuum deposited, planar-heterojunction CH3NH3PbIx−3Clx perovskite solar cells. Through a series of hole-transport materials, with conductivity values set using controlled p-doping of the layer, we correlate their ionization potentials with the open-circuit voltage of the device. With ionization potentials beyond 5.3 eV, a substantial decrease in both current density and voltage is observed, which highlights the delicate energetic balance between driving force for hole-extraction and maximizing the photovoltage. In contrast, when an optimal ionization potential match is found, the open-circuit voltage can be maximized, leading to power conversion efficiencies of up to 10.9%. These values are obtained with hole-transport materials that differ from the commonly used Spiro-MeO-TAD and correspond to a 40% performance increase versus this reference.

Development of the work function approach to the underpotential deposition of metals. Application to the hydrogen evolution reaction

International Nuclear Information System (INIS)

Trasatti, S.

1975-01-01

A theory is developed for the underpotential deposition of metals. Concepts are then extended to oxygen and hydrogen adsorption. Analysis of results shows that, unlike oxygen adsorption, hydrogen adsorption in solution probably follows a different pattern with respect to the gas phase situation. The hydrogen evolution reaction is discussed in the light of the above findings and it is shown that usual concepts regarding the reactivity scale of metals towards hydrogen should be reconsidered taking into account solvent and entropy effects. The latters can account for the behaviour of sp-metals. The formers are important with transition metals. The final picture is consistent with the idea that M-H 2 O interactions are much stronger on transition than on sp-metals. (orig.) [de

Mineral Deposit Data for Epigenetic Base- and Precious-metal and Uranium-thorium Deposits in South-central and Southwestern Montana and Southern and Central Idaho

Science.gov (United States)

Klein, T.L.

2004-01-01

Metal deposits spatially associated with the Cretaceous Boulder and Idaho batholiths of southwestern Montana and southern and central Idaho have been exploited since the early 1860s. Au was first discovered in placer deposits; exploitation of vein deposits in bedrock soon followed. In 1865, high-grade Ag vein deposits were discovered and remained economically important until the 1890s. Early high-grade deposits of Au, Ag and Pb were found in the weathered portions of the veins systems. As mining progressed to deeper levels, Ag and Pb grades diminished. Exploration for and development of these vein deposits in this area have continued until the present. A majority of these base- and precious-metal vein deposits are classified as polymetallic veins (PMV) and polymetallic carbonate-replacement (PMR) deposits in this compilation. Porphyry Cu and Mo, epithermal (Au, Ag, Hg and Sb), base- and precious-metal and W skarn, W vein, and U and Th vein deposits are also common in this area. The world-class Butte Cu porphyry and the Butte high-sulfidation Cu vein deposits are in this study area. PMV and PMR deposits are the most numerous in the region and constitute about 85% of the deposit records compiled. Several types of syngenetic/diagenetic sulfide mineral deposits in rocks of the Belt Supergroup or their equivalents are common in the region and they have been the source of a substantial metal production over the last century. These syngenetic deposits and their metamorphosed/structurally remobilized equivalents were not included in this database; therefore, deposits in the Idaho portion of the Coeur d'Alene district and the Idaho Cobalt belt, for example, have not been included because many of them are believed to be of this type.

Novel Non-Vacuum Fabrication of Solid State Lithium Ion Battery Components

Energy Technology Data Exchange (ETDEWEB)

Oladeji, I. [Planar Energy Devices, Inc.; Wood, D. L. [ORNL; Wood, III, D. L.

2012-10-19

The purpose of this Cooperative Research and Development Agreement (CRADA) between Oak Ridge National Laboratory (ORNL) and Planar Energy Devices, Inc. was to develop large-scale electroless deposition and photonic annealing processes associated with making all-solid-state lithium ion battery cathode and electrolyte layers. However, technical and processing difficulties encountered in 2011 resulted in the focus of the CRADA being redirected solely to annealing of the cathode thin films. In addition, Planar Energy Devices de-emphasized the importance of annealing of the solid-state electrolytes within the scope of the project, but materials characterization of stabilized electrolyte layers was still of interest. All-solid-state lithium ion batteries are important to automotive and stationary energy storage applications because they would eliminate the problems associated with the safety of the liquid electrolyte in conventional lithium ion batteries. However, all-solid-state batteries are currently produced using expensive, energy consuming vacuum methods suited for small electrode sizes. Transition metal oxide cathode and solid-state electrolyte layers currently require about 30-60 minutes at 700-800°C vacuum processing conditions. Photonic annealing requires only milliseconds of exposure time at high temperature and a total of <1 min of cumulative processing time. As a result, these processing techniques are revolutionary and highly disruptive to the existing lithium ion battery supply chain. The current methods of producing all-solid-state lithium ion batteries are only suited for small-scale, low-power cells and involve high-temperature vacuum techniques. Stabilized LiNixMnyCozAl1-x-y-zO2 (NMCA) nanoparticle films were deposited onto stainless steel substrates using Planar Energy Devices’ streaming process for electroless electrochemical deposition (SPEED). Since successful SPEED trials were demonstrated by Planar Energy Devices with NMCA prior to 2010, this

Energy deposition in liquid metals for D-T, D-D and T-T fusion sources

International Nuclear Information System (INIS)

Ragheb, M.M.H.; Zahakaylo, D.

1983-01-01

The nuclear performance of candidate liquid metals: lithium, lead, sodium, potassiu, Na(22%) K(78%), Na(56%) K(44%), is estimated with respect to their neutron and gamma-ray heat deposition rates. Three different neutron sources are considered: DT, DD and TT fusion neutrons. This is intended for the cooling of inertial confinement cavities using fusion pellets with internal tritrium breeding that will possibly eliminate the need to breed tritium in a lithium blanket. Compared to lithium with respect to neutron and gamma energy generation, blanket multiplication and pumping power, it appears that the considered metals can be used only if the environmental and safety advantages from the reduction of the tritium inventory and the avoidance of lithium, outweight the lithium advantages in higher energy production and lower pumping requirement by one to two orders of magnitude. (orig.) [de

Controlled growth of Au nanoparticles in co-evaporated metal/polymer composite films and their optical and electrical properties

Science.gov (United States)

Takele, H.; Schürmann, U.; Greve, H.; Paretkar, D.; Zaporojtchenko, V.; Faupel, F.

2006-02-01

Nanocomposite films containing Au nanoparticles embedded in a polymer matrix were prepared by vapour phase co-deposition of Au and polymers (Teflon AF and Poly(α -methylstyrene)) in high vacuum. The microstructure of the composite materials as well as metal content strongly depend on the condensation coefficient of the Au atoms, the deposition rates of the components, the substrate temperature, and the type of polymer matrix. The condensation coefficient, which varies between 0.03 and 1, was determined from energy dispersive X-ray spectrometer (EDX) and surface profilometry. It is shown that the microstructure of nanocomposites (size, size distribution, and interparticle separation of metal clusters), which was determined by transmission electron microscopy, can be controlled by the deposition parameters and the choice of polymer matrix. The optical absorption in the visible region due to the particle plasmon resonance has a strong dependence on the metal filling factor. The correlation between the microstructure of nanocomposites and optical properties, studied using UV-Vis spectroscopy, was also established. Further more, the electrical properties of the composites were studied as a function of the metal volume fraction. It was observed that the nanocomposite films exhibit a percolation threshold at a metal volume fraction of 0.43 and 0.20 for gold nanoclusters in Teflon AF and Poly(α-methylstyrene), respectively.

Analysis of the aging/stability process of organic solar cells based on PTB7:[70]PCBM and an alternative free-vacuum deposited cathode: the effect of active layer scaling

Science.gov (United States)

Barreiro-Argüelles, Denisse; Ramos-Ortiz, Gabriel; Maldonado, José-Luis L.; Romero-Borja, Daniel; Meneses-Nava, Marco-Antonio; Pérez-Gutiérrez, Enrique

2017-08-01

The PV performance and aging/stability of organic photovoltaic (OPV) devices based on the well-known system PTB7:[70]PCBM and an alternative air-stable electrode deposited at room conditions are fully studied when the active area is scaled by a factor of 25. On the other hand, the aging/stability processes were also studied through single diode model, impedance spectroscopy and light-beam induced current (LBIC) measurements in accordance with the established ISOS-D1 (dark storage) and ISOS-L1 (illumination conditions) protocols. Results are a good indication that the alternative cathode Field's metal (FM) cathode works as an encapsulating material and provides excellent PV performance comparable with the common and costly high-vacuum evaporated Al cathode.

Line profile analyses of rhodium metal obtained by decomposition of rhodium carbonyl

International Nuclear Information System (INIS)

Chandra, D.; Mandalia, H.; Garner, M.L.; Blakely, M.K.; Lau, K.H.

1995-01-01

Metal carbonyls are important for chemical vapor deposition (CVD) of metals and alloys and formation of high surface area metallic particles which have potential applications as catalysts. Rhodium carbonyl [Rh 6 (CO) 16 ] produces high surface area metallic particles whose structure has been reported as monoclinic (I2/a) with lattice dimensions, a=17.00(±0.03)Angstrom, b=9.78(±0.02)Angstrom, c=17.53(±0.03)Angstrom and Β=121 degrees 45' ± 30' at room temperature. Generally, metal carbonyl crystals dissociate under vacuum as carbonyl gas and decompose to metallic crystals and carbon monoxide at higher temperatures. However, the behavior of rhodium carbonyl crystals is different; they decompose directly to metallic rhodium without the formation of rhodium carbonyl gas in vacuum. Several residual fine grains of rhodium metal are found after the decomposition in vacuum at relatively low temperatures. The metallic samples of rhodium were obtained from vapor pressure experiments using torsion Knudsen-effusion apparatus. X-ray diffraction analyses performed on these gains showed severely broadened Bragg reflections indicative of small particle size and/or lattice microgram. In this study, a comparison of lattice strains and domain sizes obtained by integral breadth and Fourier methods has been made. In addition a comparison of the lattice strains and domain sizes has been made between the Cauchy, Gaussian, Cauchy-Gaussian and Aqua integral breadth methods

Metal oxide collectors for storing matter technique applied in secondary ion mass spectrometry

Energy Technology Data Exchange (ETDEWEB)

Miśnik, Maciej [Institute of Tele and Radio Technology, ul. Ratuszowa 11, 03-450 Warszawa (Poland); Gdańsk University of Technology (Poland); Konarski, Piotr [Institute of Tele and Radio Technology, ul. Ratuszowa 11, 03-450 Warszawa (Poland); Zawada, Aleksander [Institute of Tele and Radio Technology, ul. Ratuszowa 11, 03-450 Warszawa (Poland); Military University of Technology, Warszawa (Poland)

2016-03-15

We present results of the use of metal and metal oxide substrates that serve as collectors in ‘storing matter’, the quantitative technique of secondary ion mass spectrometry (SIMS). This technique allows separating the two base processes of secondary ion formation in SIMS. Namely, the process of ion sputtering is separated from the process of ionisation. The technique allows sputtering of the analysed sample and storing the sputtered material, with sub-monolayer coverage, onto a collector surface. Such deposits can be then analysed by SIMS, and as a result, the so called ‘matrix effects’ are significantly reduced. We perform deposition of the sputtered material onto Ti and Cu substrates and also onto metal oxide substrates as molybdenum, titanium, tin and indium oxides. The process of sputtering is carried within the same vacuum chamber where the SIMS analysis of the collected material is performed. For sputtering and SIMS analysis of the deposited material we use 5 keV Ar{sup +} beam of 500 nA. The presented results are obtained with the use of stationary collectors. Here we present a case study of chromium. The obtained results show that the molybdenum and titanium oxide substrates used as collectors increase useful yield by two orders, with respect to such pure elemental collectors as Cu and Ti. Here we define useful yield as a ratio of the number of detected secondary ions during SIMS analysis and the number of atoms sputtered during the deposition process.

Structural, mechanical, electrical and wetting properties of ZrNx films deposited by Ar/N2 vacuum arc discharge: Effect of nitrogen partial pressure

Science.gov (United States)

Abdallah, B.; Naddaf, M.; A-Kharroub, M.

2013-03-01

Non-stiochiometric zirconium nitride (ZrNx) thin films have been deposited on silicon substrates by vacuum arc discharge of (N2 + Ar) gas mixtures at different N2 partial pressure ratio. The microstructure, mechanical, electrical and wetting properties of these films are studied by means of X-ray diffraction (XRD), micro-Raman spectroscopy, Rutherford back scattering (RBS) technique, conventional micro-hardness testing, electrical resistivity, atomic force microscopy (AFM) and contact angle (CA) measurements. RBS results and analysis show that the (N/Zr) ratio in the film increases with increasing the N2 partial pressure. A ZrNx film with (Zr/N) ratio in the vicinity of stoichiometric ZrN is obtained at N2 partial pressure of 10%. XRD and Raman results indicate that all deposited films have strained cubic crystal phase of ZrN, regardless of the N2 partial pressure. On increasing the N2 partial pressure, the relative intensity of (1 1 1) orientation with respect to (2 0 0) orientation is seen to decrease. The effect of N2 partial pressure on micro-hardness and the resistivity of the deposited film is revealed and correlated to the alteration of grain size, crystallographic texture, stoichiometry and residual stress developed in the film. In particular, it is found that residual stress and nitrogen incorporation in the film play crucial role in the alteration of micro-hardness and resistivity respectively. In addition, CA and AFM results demonstrate that as N2 partial pressure increases, both the surface hydrophobicity and roughness of the deposited film increase, leading to a significant decrease in the film surface free energy (SFE).

The effect of substrate bias on titanium carbide/amorphous carbon nanocomposite films deposited by filtered cathodic vacuum arc

International Nuclear Information System (INIS)

Zhang, Xu; Liang, Hong; Wu, Zhenglong; Wu, Xiangying; Zhang, Huixing

2013-01-01

The titanium carbide/amorphous carbon nanocomposite films have been deposited on silicon substrate by filtered cathodic vacuum arc (FCVA) technology, the effects of substrate bias on composition, structures and mechanical properties of the films are studied by scanning electron spectroscopy, X-ray diffraction and X-ray photoelectron spectroscopy and nano-indentation. The results show that the Ti content, deposition rate and hardness at first increase and then decrease with increasing the substrate bias. Maximum hardness of the titanium carbide/amorphous carbon nanocomposite film is 51 Gpa prepared at −400 V. The hardness enhancement may be attributed to the compressive stress and the fraction of crystalline TiC phase due to ion bombardment

Structural strengthening of rocket nozzle extension by means of laser metal deposition

Science.gov (United States)

Honoré, M.; Brox, L.; Hallberg, M.

2012-03-01

Commercial space operations strive to maximize the payload per launch in order to minimize the costs of each kg launched into orbit; this yields demand for ever larger launchers with larger, more powerful rocket engines. Volvo Aero Corporation in collaboration with Snecma and Astrium has designed and tested a new, upgraded Nozzle extension for the Vulcain 2 engine configuration, denoted Vulcain 2+ NE Demonstrator The manufacturing process for the welding of the sandwich wall and the stiffening structure is developed in close cooperation with FORCE Technology. The upgrade is intended to be available for future development programs for the European Space Agency's (ESA) highly successful commercial launch vehicle, the ARIANE 5. The Vulcain 2+ Nozzle Extension Demonstrator [1] features a novel, thin-sheet laser-welded configuration, with laser metal deposition built-up 3D-features for the mounting of stiffening structure, flanges and for structural strengthening, in order to cope with the extreme load- and thermal conditions, to which the rocket nozzle extension is exposed during launch of the 750 ton ARIANE 5 launcher. Several millimeters of material thickness has been deposited by laser metal deposition without disturbing the intricate flow geometry of the nozzle cooling channels. The laser metal deposition process has been applied on a full-scale rocket nozzle demonstrator, and in excess of 15 kilometers of filler wire has been successfully applied to the rocket nozzle. The laser metal deposition has proven successful in two full-throttle, full-scale tests, firing the rocket engine and nozzle in the ESA test facility P5 by DLR in Lampoldshausen, Germany.

Influence of laser power on microstructure of laser metal deposited 17-4 ph stainless steel

CSIR Research Space (South Africa)

Adeyemi, AA

2017-09-01

Full Text Available The influence of laser power on the microstructure of 17-4 PH stainless steel produced by laser metal deposition was investigated. Multiple-trackof 17-4 stainless steel powder was deposited on 316 stainless steel substrate using laser metal...

Modeling of liquid-metal corrosion/deposition in a fusion reactor blanket

International Nuclear Information System (INIS)

Malang, S.; Smith, D.L.

1984-04-01

A model has been developed for the investigation of the liquid-metal corrosion and the corrosion product transport in a liquid-metal-cooled fusion reactor blanket. The model describes the two-dimensional transport of wall material in the liquid-metal flow and is based on the following assumptions: (1) parallel flow in a straight circular tube; (2) transport of wall material perpendicular to the flow direction by diffusion and turbulent exchange; in flow direction by the flow motion only; (3) magnetic field causes uniform velocity profile with thin boundary layer and suppresses turbulent mass exchange; and (4) liquid metal at the interface is saturated with wall material. A computer code based on this model has been used to analyze the corrosion of ferritic steel by lithium lead and the deposition of wall material in the cooler part of a loop. Three cases have been investigated: (1) ANL forced convection corrosion experiment (without magnetic field); (2) corrosion in the MARS liquid-metal-cooled blanket (with magnetic field); and (3) deposition of wall material in the corrosion product cleanup system of the MARS blanket loop

Non-vacuum, single-step conductive transparent ZnO patterning by ultra-short pulsed laser annealing of solution-deposited nanoparticles

Energy Technology Data Exchange (ETDEWEB)

Lee, Daeho; Pan, Heng; Kim, Eunpa; Grigoropoulos, Costas P. [University of California, Department of Mechanical Engineering, Berkeley, CA (United States); Ko, Seung Hwan [Korea Advanced Institute of Science and Technology (KAIST), Department of Mechanical Engineering, Daejeon (Korea, Republic of); Park, Hee K. [AppliFlex LLC, Sunnyvale, CA (United States)

2012-04-15

A solution-processable, high-concentration transparent ZnO nanoparticle (NP) solution was successfully synthesized in a new process. A highly transparent ZnO thin film was fabricated by spin coating without vacuum deposition. Subsequent ultra-short-pulsed laser annealing at room temperature was performed to change the film properties without using a blanket high temperature heating process. Although the as-deposited NP thin film was not electrically conductive, laser annealing imparted a large conductivity increase and furthermore enabled selective annealing to write conductive patterns directly on the NP thin film without a photolithographic process. Conductivity enhancement could be obtained by altering the laser annealing parameters. Parametric studies including the sheet resistance and optical transmittance of the annealed ZnO NP thin film were conducted for various laser powers, scanning speeds and background gas conditions. The lowest resistivity from laser-annealed ZnO thin film was about 4.75 x 10{sup -2} {omega} cm, exhibiting a factor of 10{sup 5} higher conductivity than the previously reported furnace-annealed ZnO NP film and is even comparable to that of vacuum-deposited, impurity-doped ZnO films within a factor of 10. The process developed in this work was applied to the fabrication of a thin film transistor (TFT) device that showed enhanced performance compared with furnace-annealed devices. A ZnO TFT performance test revealed that by just changing the laser parameters, the solution-deposited ZnO thin film can also perform as a semiconductor, demonstrating that laser annealing offers tunability of ZnO thin film properties for both transparent conductors and semiconductors. (orig.)

Investigation of vacuum deposited hybrid coatings of protic organic UV absorbers embedded in a silica matrix used for the UV protection of Polycarbonate glazing

OpenAIRE

Weber, C.; Schulz, U.; Mühlig, C.; Kaiser, N.; Tünnermann, A.

2016-01-01

A study of vacuum-deposited organic-inorganic hybrid coatings for UV protection of polycarbonate is presented. UV-absorbing compounds, which are commonly used for polycarbonate, were embedded in a silica matrix by thermal co-evaporation under high vacuum. In addition to the optical properties of the coatings, the influence of the silica network on the organic UV absorber and the stability of the intramolecular hydrogen bond (IMHB) are discussed. A model is presented to show the interaction be...

Spray deposition of steam treated and functionalized single-walled and multi-walled carbon nanotube films for supercapacitors

International Nuclear Information System (INIS)

Zhao Xin; Chu, Bryan T T; Johnston, Colin; Sykes, John M; Grant, Patrick S; Ballesteros, Belen; Wang Weiliang

2009-01-01

Steam purified, carboxylic and ester functionalized single-walled carbon nanotube (SWNT) and multi-walled carbon nanotube (MWNT) films with homogeneous distribution and flexible control of thickness and area were fabricated on polymeric and metallic substrates using a modified spray deposition technique. By employing a pre-sprayed polyelectrolyte, the adhesion of the carbon nanotube (CNT) films to the substrates was significantly enhanced by electrostatic interaction. Carboxylic and ester functionalization improved electrochemical performance when immersed in 0.1 M H 2 SO 4 and the specific capacitance reached 155 and 77 F g -1 for carboxylic functionalized SWNT and MWNT films respectively. Compared with existing techniques such as hot pressing, vacuum filtration and dip coating, the ambient pressure spray deposition technique is suggested as particularly well suited for preparing CNT films at large scale for applications including providing electrodes for electrochemical supercapacitors and paper batteries.

Fundamentals of a moderate thermocracking-deep deasphalting combined process of Karamay vacuum residue

Energy Technology Data Exchange (ETDEWEB)

Zhiming, X; Tonghua, L.; Suogi, Z.; Renan, W. [University of Petroleum, State Key Laboratory of Heavy Oil Processing, Beijing (China); Lailong, L.; Zhen, L. [Karamay Petrochemical Company, Petrochemical Research Institute, Karamay (China)

2004-07-01

Thermocracking of heavy oil vacuum residue was carried out to determine the optimum conditions for the thermal cracking of Karamay vacuum residue prior to coke formation. The vacuum residue and the cracked residue after distillation were separated using supercritical fluid extraction and fractionation techniques. Sixteen and thirteen fractions and non-extractable end cuts respectively were separated, and their properties, compositions and average structures determined. Solubility parameters of the end cuts were measured, and those of the fractions calculated. The solubility parameter of the end cut of distilled residue was found to have greatly increased. It was determined that when the difference of the end cut and the extractable fractions amounts to 6.37MPa1/2, in the case of Karamay vacuum residue coke will deposit under thermocracking conditions. Based on the results of a series of solvent deep deasphalting experiments, a scheme for vacuum residue thermocracking and deasphalting of the cracked residue was proposed.

The multilayered structure of ultrathin amorphous carbon films synthesized by filtered cathodic vacuum arc deposition

KAUST Repository

Wang, Na

2013-08-01

The structure of ultrathin amorphous carbon (a-C) films synthesized by filtered cathodic vacuum arc (FCVA) deposition was investigated by high-resolution transmission electron microscopy, electron energy loss spectroscopy, and x-ray photoelectron spectroscopy. Results of the plasmon excitation energy shift and through-thickness elemental concentration show a multilayered a-C film structure comprising an interface layer consisting of C, Si, and, possibly, SiC, a buffer layer with continuously increasing sp 3 fraction, a relatively thicker layer (bulk film) of constant sp 3 content, and an ultrathin surface layer rich in sp 2 hybridization. A detailed study of the C K-edge spectrum indicates that the buffer layer between the interface layer and the bulk film is due to the partial backscattering of C+ ions interacting with the heavy atoms of the silicon substrate. The results of this study provide insight into the minimum thickness of a-C films deposited by FCVA under optimum substrate bias conditions. Copyright © 2013 Materials Research Society.

Breakdown dynamics of electrically exploding thin metal wires in vacuum

Science.gov (United States)

Sarkisov, G. S.; Caplinger, J.; Parada, F.; Sotnikov, V. I.

2016-10-01

Using a two-frame intensified charge coupled device (iCCD) imaging system with a 2 ns exposure time, we observed the dynamics of voltage breakdown and corona generation in experiments of fast ns-time exploding fine Ni and stainless-steel (SS) wires in a vacuum. These experiments show that corona generation along the wire surface is subjected to temporal-spatial inhomogeneity. For both metal wires, we observed an initial generation of a bright cathode spot before the ionization of the entire wire length. This cathode spot does not expand with time. For 25.4 μm diameter Ni and SS wire explosions with positive polarity, breakdown starts from the ground anode and propagates to the high voltage cathode with speeds approaching 3500 km/s or approximately one percent of light speed.

Adhesion of rhodium films on metallic substrates

International Nuclear Information System (INIS)

Marot, L.; Covarel, G.; Tuilier, M.-H.; Steiner, R.; Oelhafen, P.

2008-01-01

Rhodium coated metallic films were prepared by magnetron sputtering on metallic substrates. All films were elaborated in same conditions on copper, molybdenum and stainless steel. Adhesion strength tests were carried out by scratch test. The results reveal that the adhesion strength between the film and the substrate is influenced by the hardness of the substrate. Increase of deposition temperature improves the adhesion of the coating. In addition, pre-treatment of substrates by a filtered cathodic vacuum arc and the layer thickness have has some effects on the final adhesion strength

Adhesion of rhodium films on metallic substrates

Energy Technology Data Exchange (ETDEWEB)

Marot, L. [Department of Physics, University of Basel, Klingelbergstrasse 82, CH-4056 Basel (Switzerland)], E-mail: laurent.marot@unibas.ch; Covarel, G.; Tuilier, M.-H. [Laboratoire Mecanique, Materiaux et Procedes de Fabrication, Pole STIC-SPI-Math 61 rue Albert Camus, Universite de Haute-Alsace, F-68093 - Mulhouse Cedex (France); Steiner, R.; Oelhafen, P. [Department of Physics, University of Basel, Klingelbergstrasse 82, CH-4056 Basel (Switzerland)

2008-09-01

Rhodium coated metallic films were prepared by magnetron sputtering on metallic substrates. All films were elaborated in same conditions on copper, molybdenum and stainless steel. Adhesion strength tests were carried out by scratch test. The results reveal that the adhesion strength between the film and the substrate is influenced by the hardness of the substrate. Increase of deposition temperature improves the adhesion of the coating. In addition, pre-treatment of substrates by a filtered cathodic vacuum arc and the layer thickness have has some effects on the final adhesion strength.

Atmospheric heavy metal deposition in the Copenhagen area

DEFF Research Database (Denmark)

Andersen, Allan; Hovmand, Mads Frederik; Johnsen, Ib

1978-01-01

Atmospheric dry and wet deposition (bulk precipitation) of the heavy metals Cu, Pb, Zn, Ni, V and Fe over the Copenhagen area was measured by sampling in plastic funnels from 17 stations during a twelve-month period. Epigeic bryophytes from 100 stations in the area were analysed for the heavy...

3. International Symposium 'Vacuum Technology and Equipment'. ISVTE-3

International Nuclear Information System (INIS)

Kogan, V.S.; Shulaev, V.M.

1999-01-01

The reports of the 3th International Symposium 'Vacuum Technology and Equipment', which was held in Kharkov at 22-24 September 1999 are presented. In this issue such subject are published: - structure and properties of thin films and coatings, and their dependencies on deposition and treatment regimes; - uses of vacuum in research and applied fields, investigation and control of vacuum systems parameters, vacuum research

Vacuum system for ISABELLE

International Nuclear Information System (INIS)

Hobson, J.P.

1975-01-01

An analysis is presented of the proposed vacuum system for the planned ISABELLE storage rings with respect to acceptability and practicality from the vacuum viewport. A comparison is made between the proposed vacuum system and the vacuum system at the CERN ISR, and some comments on various design and operational parameters are made

Structure and phase composition of the titanium dioxide thin films deposited on the surface of the metallized track membranes from polyethyleneterephthalate by reactive magnetron sputtering

International Nuclear Information System (INIS)

Artoshina, O.V.; Semina, V.K.; Kochnev, Yu.K.; Nechaev, A.N.; Apel', P.Yu.; Milovich, F.O.; Iskhakova, L.D.; Ermakov, R.P.; Rossouw, A.; Gorberg, B.L.

2016-01-01

Thin films of TiO 2 , Ag, Ag-TiO 2 , Cu-TiO 2 deposited on the surface of polyethyleneterephthalate track membranes (TM) were investigated. Metals and oxide deposition was carried out by the method of vacuum reactive sputtering with application of a planar magnetron. The microstructure of samples was studied by the scanning and transmission electron microscopy (TEM) techniques. The elemental composition of coatings was investigated using energy-dispersive spectroscopy. For the identification of phase structure, X-ray diffraction phase analysis was used at various temperatures, and the XRD crystal structure patterns of the samples were obtained by the selected area electron diffraction (SAED) in TEM analysis. It was found that titanium dioxide on the TM surface can be present in three forms: nanocrystals of tetragonal anatase with impurity of rhombic brookite and the so-called X-ray amorphous TiO 2 . Cubical Cu 2 O was identified in TM metallized by copper. Optical properties of composite membranes and films were investigated by the method of absorption spectroscopy. Calculation of energies of the direct and indirect allowed optical transitions was carried out based on the analysis of absorption spectra of the studied composite membranes. [ru

Atmospheric Deposition of Heavy Metals in Soil Affected by Different Soil Uses of Southern Spain

Science.gov (United States)

Acosta, J. A.; Faz, A.; Martínez-Martínez, S.; Bech, J.

2009-04-01

Heavy metals are a natural constituent of rocks, sediments and soils. However, the heavy metal content of top soils is also dependent on other sources than weathering of the indigenous minerals; input from atmospheric deposition seems to be an important pathway. Atmospheric deposition is defined as the process by which atmospheric pollutants are transferred to terrestrial and aquatic surfaces and is commonly classified as either dry or wet. The interest in atmospheric deposition has increased over the past decade due to concerns about the effects of deposited materials on the environment. Dry deposition provides a significant mechanism for the removal of particles from the atmosphere and is an important pathway for the loading of heavy metals into the soil ecosystem. Within the last decade, an intensive effort has been made to determine the atmospheric heavy metal deposition in both urban and rural areas. The main objective of this study was to identification of atmospheric heavy metals deposition in soil affected by different soil uses. Study area is located in Murcia Province (southeast of Spain), in the surroundings of Murcia City. The climate is typically semiarid Mediterranean with an annual average temperature of 18°C and precipitation of 350 mm. In order to determine heavy metals atmospheric deposition a sampling at different depths (0-1 cm, 1-5 cm, 5-15 cm and 15-30 cm) was carried out in 7 sites including agricultural soils, two industrial areas and natural sites. The samples were taken to the laboratory where, dried, passed through a 2 mm sieve, and grinded. For the determination of the moisture the samples were weighed and oven dried at 105 °C for 24 h. The total amounts of metals (Pb, Cu, Pb, Zn, Cd, Mn, Ni and Cr) were determined by digesting the samples with nitric/perchoric acids and measuring with ICP-MS. Results showed that zinc contamination in some samples of industrial areas was detected, even this contamination reaches 30 cm depth; thus it is

Molecular Models for DSMC Simulations of Metal Vapor Deposition

OpenAIRE

Venkattraman, A; Alexeenko, Alina A

2010-01-01

The direct simulation Monte Carlo (DSMC) method is applied here to model the electron‐beam (e‐beam) physical vapor deposition of copper thin films. A suitable molecular model for copper‐copper interactions have been determined based on comparisons with experiments for a 2D slit source. The model for atomic copper vapor is then used in axi‐symmetric DSMC simulations for analysis of a typical e‐beam metal deposition system with a cup crucible. The dimensional and non‐dimensional mass fluxes obt...

Optimization of Strontium Titanate (SrTiO3) Thin Films Fabricated by Metal Organic Chemical Vapor Deposition (MOCVD) for Microwave-Tunable Devices

Science.gov (United States)

2015-12-01

characteristics . Our work demonstrated a significant increase in the quality of the optimized STO thin films with respect to STO films grown prior to the MOCVD...deposition, the reactor and precursor supply lines were baked at 250 °C for at least 4 h with a total Ar carrier gas flow of 5,000 sccm to remove...S. Thermal leakage characteristics of Pt/SrTiO3/Pt structures. Journal of Vacuum Science & Technology A. 2008;26:555–557. 31. Ryen L, Olsson E

Shiva and Argus target diagnostics vacuum systems

International Nuclear Information System (INIS)

Glaros, S.S.; Mayo, S.E.; Campbell, D.; Holeman, D.

1978-09-01

The normal operation of LLL's Argus and Shiva laser irradiation facilities demand a main vacuum system for the target chamber and a separate local vacuum system for each of the larger appendage dianostics. This paper will describe the Argus and Shiva main vacuum systems, their respective auxiliary vacuum systems and the individual diagnostics with their respective special vacuum requirements and subsequent vacuum systems. Our latest approach to automatic computer-controlled vacuum systems will be presented

Patterned Liquid Metal Contacts for Printed Carbon Nanotube Transistors.

Science.gov (United States)

Andrews, Joseph B; Mondal, Kunal; Neumann, Taylor V; Cardenas, Jorge A; Wang, Justin; Parekh, Dishit P; Lin, Yiliang; Ballentine, Peter; Dickey, Michael D; Franklin, Aaron D

2018-05-14

Flexible and stretchable electronics are poised to enable many applications that cannot be realized with traditional, rigid devices. One of the most promising options for low-cost stretchable transistors are printed carbon nanotubes (CNTs). However, a major limiting factor in stretchable CNT devices is the lack of a stable and versatile contact material that forms both the interconnects and contact electrodes. In this work, we introduce the use of eutectic gallium-indium (EGaIn) liquid metal for electrical contacts to printed CNT channels. We analyze thin-film transistors (TFTs) fabricated using two different liquid metal deposition techniques-vacuum-filling polydimethylsiloxane (PDMS) microchannel structures and direct-writing liquid metals on the CNTs. The highest performing CNT-TFT was realized using vacuum-filled microchannel deposition with an in situ annealing temperature of 150 °C. This device exhibited an on/off ratio of more than 10 4 and on-currents as high as 150 μA/mm-metrics that are on par with other printed CNT-TFTs. Additionally, we observed that at room temperature the contact resistances of the vacuum-filled microchannel structures were 50% lower than those of the direct-write structures, likely due to the poor adhesion between the materials observed during the direct-writing process. The insights gained in this study show that stretchable electronics can be realized using low-cost and solely solution processing techniques. Furthermore, we demonstrate methods that can be used to electrically characterize semiconducting materials as transistors without requiring elevated temperatures or cleanroom processes.

Introduction to vacuum technology: supplementary study material developed for IVS sponsored vacuum courses

International Nuclear Information System (INIS)

Bhusan, K.G.

2008-01-01

Vacuum technology has advanced to a large extent mainly from the demands of experimental research scientists who have more than ever understood the need for clean very low pressure environments. This need only seems to increase as the lowest pressures achievable in a laboratory setup are dropping down by the decade. What is not usually said is that conventional techniques of producing ultrahigh vacuum have also undergone a metamorphosis in order to cater to the multitude of restrictions in modern day scientific research. This book aims to give that practical approach to vacuum technology. The basics are given in the first chapter with more of a definition oriented approach - which is practically useful. The second chapter deals with the production of vacuum and ultrahigh vacuum with an emphasis on the working principles of several pumps and their working pressure ranges. Measurement of low pressures, both total and partial is presented in the third chapter with a note on leak detection and mass spectrometric techniques. Chapter 4 gives an overview of the materials that are vacuum compatible and their material properties. Chapter 5 gives the necessary methods to be followed for cleaning of vacuum components especially critical if ultrahigh vacuum environment is required. The practical use of a ultrahigh vacuum environment is demonstrated in Chapter 6 for production of high quality thin films through vapour deposition

Characterization of diamond-like carbon coatings prepared by pulsed bias cathodic vacuum arc deposition

International Nuclear Information System (INIS)

Wu Jinbao; Chang, J.-J.; Li, M.-Y.; Leu, M.-S.; Li, A.-K.

2007-01-01

Hydrogen free diamond-like carbon (DLC) coatings have been deposited on Si(100) and stainless steel substrates by cathodic vacuum arc plasma deposition with pulse voltage. Adherent deposits on silicon can be obtained through applying gradient Ti/TiC/DLC layers. A pulse bias of - 100 V was applied to the substrate in order to obtain a denser structure of DLC coating approximately 1 μm thick. The microstructure and hardness value of DLC films were analyzed by using X-ray photoelectron spectroscopy and nano-indenter. The experimental results show that the duty cycle strongly influenced the hardness and sp 3 content of the DLC coatings. We observed that when the duty cycle was raised from 2.5% to 12.5%, the hardness increased from 26 GPa to 49 GPa, and the sp 3 fraction of the DLC films measured by XPS increased from 39% to 50.8 % as well. But at constant duty cycle, say 12.5%, the hardness is dropped from 49 to 14 GPa in proportion to the increase of residual gas pressure from 3 x 10 -3 Pa to 1 Pa. As the residual gas pressure increased, collisional phenomenon will decrease the energy of the ions. Ions with low energy make more graphitic carbon links and result in a low hardness value

The effect of carbon content on mechanical properties, failure and corrosion resistance of deposited chromium metal

Directory of Open Access Journals (Sweden)

Леонід Кімович Лещинськiй

2017-06-01

Full Text Available It has been shown that if choosing a metal composition for surfacing rolls and rollers of continuous casting machines, both the carbon impact on the mechanical and functional properties and the critical values of the chromium concentration, which determine the corrosion resistance of the metal with regard to electrochemical corrosion theory, should be considered as well. The paper studied the effect of chromium and carbon steel the X5-X12 type on the structure, technological strength, mechanical properties, fracturing resistance and corrosion resistance of the weld metal. The composition of chromium tool steels (deposited metal (X5-used for the rolls of hot rolling mills and (X12-used for continuous casting machines rollers correspond to these values. The impact of carbon on the properties of the deposited metal containing chromium was considered by comparing the data for both types of the deposited metal. It was found that for both types of the deposited metal (X5 and X12, the limiting value of the carbon content, providing an optimal combination of strength, ductility, failure resistance is the same. If the carbon content is more than the limiting value – (0,25% the technological strength and failure resistance of the deposited metal significantly reduce. With increasing carbon content from 0,18 to 0,25% the martensite structure has a mixed morphology – lath and plate. The strength and toughness of the deposited metal grow. Of particular interest is simultaneous increase in the specific work of failure resulted from crack inhibition at the boundary with far less solid and more ductile ferrite. As for the 5% chromium metal, the X12 type composition with 0,25% C, is borderline. With a further increase in the carbon content of the metal both ductility and failure resistance sharply decrease and with 0,40% C the growth rate of fatigue crack increases by almost 1,5 times

Effect of PbI{sub 2} deposition rate on two-step PVD/CVD all-vacuum prepared perovskite

Energy Technology Data Exchange (ETDEWEB)

Ioakeimidis, Apostolos; Christodoulou, Christos; Lux-Steiner, Martha; Fostiropoulos, Konstantinos, E-mail: fostiropoulos@helmholtz-berlin.de

2016-12-15

In this work we fabricate all-vacuum processed methyl ammonium lead halide perovskite by a sequence of physical vapour deposition of PbI{sub 2} and chemical vapour deposition (CVD) of CH{sub 3}NH{sub 3}I under a static atmosphere. We demonstrate that for higher deposition rate the (001) planes of PbI{sub 2} film show a higher degree of alignment parallel to the sample's surface. From X-ray diffraction data of the resulted perovskite film we derive that the intercalation rate of CH{sub 3}NH{sub 3}I is fostered for PbI{sub 2} films with higher degree of (001) planes alignment. The stoichiometry of the produced perovskite film is also studied by Hard X-ray photoelectron spectroscopy measurements. Complete all-vacuum perovskite solar cells were fabricated on glass/ITO substrates coated by an ultra-thin (5 nm) Zn-phthalocyanine film as hole selective layer. A dependence of residual PbI{sub 2} on the solar cells performance is displayed, while photovoltaic devices with efficiency up to η=11.6% were achieved. - Graphical abstract: A two-step PVD/CVD processed perovskite film with the CVD intercalation rate of CH{sub 3}NCH{sub 3} molecules been fostered by increasing the PVD rate of PbI{sub 2} and prolonging the CVD time. - Highlights: • A simple PVD/CVD process for perovskite film production. • Increased PVD rate yields better alignment of the PbI{sub 2} (001) crystallite planes. • CH{sub 3}NH{sub 3}I intercalation process fostered by increased PbI{sub 2} PVD rate. • Stoichiometric CH{sub 3}NH{sub 3}PbI{sub 3} suitable as absorber in photovoltaic applications • Reduced PbI{sub 2} residue at the bottom of CH{sub 3}NH{sub 3}PbI{sub 3} improves device performance.

Study of the ionization rate of the released deuterium in vacuum arc discharges with metal deuteride cathodes

Science.gov (United States)

Liu, Fei-Xiang; Long, Ji-Dong; Zheng, Le; Dong, Pan; Li, Chen; Chen, Wei

2018-02-01

The ionization rate of the released deuterium from a metal deuteride cathode in vacuum arc discharges is investigated by both experiments and modeling analysis. Experimental results show that the deuterium ionization rate increases from 2% to 30% with the increasing arc current in the range of 2-100 A. Thus the full ionization assumption, as is widely used in arc plasma simulations, is not satisfied for the released deuterium at low discharge current. According to the modeling results, the neutral-to-ion conversion efficiency for the deuterium traveling across the cathodic spot region can be significantly less than one, due to the fast plasma expansion and rarefaction in the vacuum. In addition, the model also reveals that, unlike the metal atoms which are mainly ionized in the sheath region and flow back to the cathode, the deuterium ionization primarily occurs in the quasi-neutral region and moves towards the anode. Consequently, the cathodic sheath layer acts like a filter that increases the deuterium fraction beyond the sheath region.

Vacuum-based surface modification of organic and metallic substrates

Science.gov (United States)

Torres, Jessica

Surface physico-chemical properties play an important role in the development and performance of materials in different applications. Consequently, understanding the chemical and physical processes involved during surface modification strategies is of great scientific and technological importance. This dissertation presents results from the surface modification of polymers, organic films and metallic substrates with reactive species, with the intent of simulating important modification processes and elucidating surface property changes of materials under different environments. The reactions of thermally evaporated copper and titanium with halogenated polytetrafluoroethylene (PTFE) and polyvinyl chloride (PVC) are used to contrast the interaction of metals with polymers. Results indicate that reactive metallization is thermodynamically favored when the metal-halogen bond strength is greater than the carbon-halogen bond strength. X-ray post-metallization treatment results in an increase in metal-halide bond formation due to the production of volatile halogen species in the polymer that react with the metallic overlayer. The reactions of atomic oxygen (AO) and atomic chlorine with polyethylene (PE) and self-assembled monolayers (SAMs) films were followed to ascertain the role of radical species during plasma-induced polymer surface modification. The reactions of AO with X-ray modified SAMs are initially the dominated by the incorporation of new oxygen containing functionality at the vacuum/film interface, leading to the production of volatile carbon containing species such as CO2 that erodes the hydrocarbon film. The reaction of atomic chlorine species with hydrocarbon SAMs, reveals that chlorination introduces C-Cl and C-Cl2 functionalities without erosion. A comparison of the reactions of AO and atomic chlorine with PE reveal a maximum incorporation of the corresponding C-O and C-Cl functionalities at the polymer surface. A novel method to prepare phosphorous

Textural Evolution During Micro Direct Metal Deposition of NiTi Alloy

Science.gov (United States)

Khademzadeh, Saeed; Bariani, Paolo F.; Bruschi, Stefania

2018-03-01

In this research, a micro direct metal deposition process, newly developed as a potential method for micro additive manufacturing was used to fabricate NiTi builds. The effect of scanning strategy on grain growth and textural evolution was investigated using scanning electron microscope equipped with electron backscattered diffraction detector. Investigations showed that, the angle between the successive single tracks has an important role in grain size distribution and textural evolution of NiTi phase. Unidirectional laser beam scanning pattern developed a fiber texture; conversely, a backward and forward scanning pattern developed a strong ‖‖ RD texture on the surface of NiTi cubic samples produced by micro direct metal deposition.

Use of vacuum in processing of uranium

International Nuclear Information System (INIS)

Saify, M.T.; Rai, C.B.; Singh, S.P.; Singh, R.P.

2003-01-01

Full text: Natural uranium in the form of metal and alloys with suitable heat treatment are being used as fuel in research and some of the power reactors. The fuel is required to satisfy the purity specification from the criteria of neutron economy, corrosion resistance and fabricability. Uranium and its alloys fall under the category of reactive materials. They readily react with atmospheric air to form oxides. If molten uranium is exposed to atmosphere, it reacts violently with atmospheric gases and moisture, leading to explosion in extreme cases. Hence, protective inert atmosphere or high vacuum is required in processing of the materials especially during the melting and casting operation. Vacuum is preferred for melting and remelting of metals and alloys to remove the gaseous and high volatile impurities, to improve the mechanical properties of the material. Also, under vacuum sound castings are produced for further processing by mechanical working or use in casting forms. The addition of reactive alloying elements in uranium is efficiently carried out under vacuum. The paper highlights vacuum systems deployed and applications of vacuum in various operations involved in the processing of uranium and its alloys

Compact vacuum insulation embodiments

Science.gov (United States)

Benson, D.K.; Potter, T.F.

1992-04-28

An ultra-thin compact vacuum insulation panel is comprised of two hard, but bendable metal wall sheets closely spaced apart from each other and welded around the edges to enclose a vacuum chamber. Glass or ceramic spacers hold the wall sheets apart. The spacers can be discrete spherical beads or monolithic sheets of glass or ceramic webs with nodules protruding therefrom to form essentially point' or line' contacts with the metal wall sheets. In the case of monolithic spacers that form line' contacts, two such spacers with the line contacts running perpendicular to each other form effectively point' contacts at the intersections. Corrugations accommodate bending and expansion, tubular insulated pipes and conduits, and preferred applications are also included. 26 figs.

The assessment of non-metallic inclusions in steels and nickel alloys for ultra high vacuum applications

International Nuclear Information System (INIS)

Meriguet, P.J.-L.

1992-01-01

The presence of non-metallic inclusions in steels and nickel alloys may create leak-paths under Ultra High Vacuum conditions. This paper shows the application of the ASTM E45 standard to the assessment of these inclusions and gives some design recommendations. Three case-histories encountered at the Joint European Torus Joint Undertaking and a possible explanation of the phenomenon are also presented. (Author)

Three-Dimensional (3D) Printing of Polymer-Metal Hybrid Materials by Fused Deposition Modeling.

Science.gov (United States)

Fafenrot, Susanna; Grimmelsmann, Nils; Wortmann, Martin; Ehrmann, Andrea

2017-10-19

Fused deposition modeling (FDM) is a three-dimensional (3D) printing technology that is usually performed with polymers that are molten in a printer nozzle and placed line by line on the printing bed or the previous layer, respectively. Nowadays, hybrid materials combining polymers with functional materials are also commercially available. Especially combinations of polymers with metal particles result in printed objects with interesting optical and mechanical properties. The mechanical properties of objects printed with two of these metal-polymer blends were compared to common poly (lactide acid) (PLA) printed objects. Tensile tests and bending tests show that hybrid materials mostly containing bronze have significantly reduced mechanical properties. Tensile strengths of the 3D-printed objects were unexpectedly nearly identical with those of the original filaments, indicating sufficient quality of the printing process. Our investigations show that while FDM printing allows for producing objects with mechanical properties similar to the original materials, metal-polymer blends cannot be used for the rapid manufacturing of objects necessitating mechanical strength.

The fabrication of short metallic nanotubes by templated electrodeposition

Energy Technology Data Exchange (ETDEWEB)

Chienwen, Huang; Hao Yaowu, E-mail: yhao@uta.ed [Department of Materials Science and Engineering, University of Texas at Arlington, Arlington, TX 76051 (United States)

2009-11-04

Template-based electrochemical synthesis has widely been used to produce metal nanowires and nanorods. Commercially available filtration membranes, such as anodic aluminum oxide (AAO) and polycarbonate track etch membranes, have commonly been utilized as hard templates for this purpose. In this process, a thick metal film is usually sputtered or vacuum evaporated onto one side of the membrane to block the pores and serve as the working electrode for the subsequent electrodeposition. Here, we show that during the deposition of the metal electrode for AAO membranes, the electrode metal diffuses into the pores and is deposited on the pore walls which leads to preferential electrodeposition of metal on the walls and therefore forms metal tubes. This phenomenon has been utilized to fabricate short nanotubes by carefully controlling the electrodeposition conditions. The process is a straightforward method for any electroplatable materials to form nanoscale tubular structures. The effects of working electrodes and electrodeposition conditions on the formation of tubular structures are discussed in detail. A new mechanism based on this simple fact is proposed to explain the formation of Ni tubes by Ni-Cu co-deposition. Also, we demonstrate how to distinguish magnetic nanotubes from nanorods by a simple magnetic measurement.

The fabrication of short metallic nanotubes by templated electrodeposition

International Nuclear Information System (INIS)

Huang Chienwen; Hao Yaowu

2009-01-01

Template-based electrochemical synthesis has widely been used to produce metal nanowires and nanorods. Commercially available filtration membranes, such as anodic aluminum oxide (AAO) and polycarbonate track etch membranes, have commonly been utilized as hard templates for this purpose. In this process, a thick metal film is usually sputtered or vacuum evaporated onto one side of the membrane to block the pores and serve as the working electrode for the subsequent electrodeposition. Here, we show that during the deposition of the metal electrode for AAO membranes, the electrode metal diffuses into the pores and is deposited on the pore walls which leads to preferential electrodeposition of metal on the walls and therefore forms metal tubes. This phenomenon has been utilized to fabricate short nanotubes by carefully controlling the electrodeposition conditions. The process is a straightforward method for any electroplatable materials to form nanoscale tubular structures. The effects of working electrodes and electrodeposition conditions on the formation of tubular structures are discussed in detail. A new mechanism based on this simple fact is proposed to explain the formation of Ni tubes by Ni-Cu co-deposition. Also, we demonstrate how to distinguish magnetic nanotubes from nanorods by a simple magnetic measurement.

Vacuum arc ion charge state distributions

International Nuclear Information System (INIS)

Brown, I.G.; Godechot, X.

1990-06-01

We have measured vacuum arc ion charge state spectra for a wide range of metallic cathode materials. The charge state distributions were measured using a time-of-flight diagnostic to monitor the energetic ion beam produced by a metal vapor vacuum arc ion source. We have obtained data for 48 metallic cathode elements: Li, C, Mg, Al, Si, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Pd, Ag, Cd, In, Sn, Ba, La, Ce, Pr, Nd, Sm, Gd, Dy, Ho, Er, Yb, Hf, Ta, W, Ir, Pt, Au, Pb, Bi, Th and U. The arc was operated in a pulsed mode with pulse length 0.25 msec; arc current was 100 A throughout. This array of elements extends and completes previous work by us. In this paper the measured distributions are cataloged and compared with our earlier results and with those of other workers. We also make some observations about the performance of the various elements as suitable vacuum arc cathode materials

Vacuum arc ion charge-state distributions

International Nuclear Information System (INIS)

Brown, I.G.; Godechot, X.

1991-01-01

The authors have measured vacuum arc ion charge-state spectra for a wide range of metallic cathode materials. The charge-state distributions were measured using a time-of-flight diagnostic to monitor the energetic ion beam produced by a metal vapor vacuum arc ion source. They have obtained data for 48 metallic cathode elements: Li, C, Mg, Al, Si, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Pd, Ag, Cd, In, Sn, Ba, La, Ce, Pr, Nd, Sm, Gd, Dy, Ho, Er, Yb, Hf, Ta, W, Ir, Pt, Au, Pb, Bi, Th, and U. The arc was operated in a pulsed mode with pulse length 0.25 ms; arc current was 100 A throughout. This array of elements extends and completes previous work by the authors. In this paper the measured distributions are cataloged and compared with their earlier results and those of other workers. They also make some observations about the performance of the various elements as suitable vacuum arc cathode materials

Solution synthesis of mixed-metal chalcogenide nanoparticles and spray deposition of precursor films

Science.gov (United States)

Schulz, Douglas L.; Curtis, Calvin J.; Ginley, David S.

2000-01-01

A colloidal suspension comprising metal chalcogenide nanoparticles and a volatile capping agent. The colloidal suspension is made by reacting a metal salt with a chalcogenide salt in an organic solvent to precipitate a metal chalcogenide, recovering the metal chalcogenide, and admixing the metal chalcogenide with a volatile capping agent. The colloidal suspension is spray deposited onto a substrate to produce a semiconductor precursor film which is substantially free of impurities.

Study of metal specific interaction, F-LUMO and VL shift to understand interface of CuPc thin films and noble metal surfaces

Energy Technology Data Exchange (ETDEWEB)

Sinha, Sumona; Mukherjee, M., E-mail: manabendra.mukherjee@saha.ac.in

2015-10-30

Graphical abstract: - Highlights: • F-LUMO, a hybridized state near E{sub F} confirms partial charge transfer. • Non-significant role of partial charge transfer in VL shift over push back effect. • Pyrrole sites affected for partial charge transfer from Cu and Ag substrates. • Negligible effect on pyrrole cites for Pt and Au substrates. - Abstract: The performances of organic electronic devices are significantly associated with their energy level alignment at organic semiconductor/metal–electrode interfaces. The electronic character of an organic semiconducting molecular over-layer on a metal surface can vary from semiconducting to metallic, depending on the nature of the molecular orbitals with respect to the Fermi level of the electrode. The general tendency of extrapolating established models for single crystal substrates to ‘real’ device substrates is highly misleading. Hence, the importance of metal specific interaction, former lowest unoccupied molecular orbital (F-LUMO) and vacuum level (VL) shift have been investigated as a function of thickness of the deposited films by means of photoelectron spectroscopy (XPS and UPS) to understand the interface between CuPc and Cu, Ag, Pt and Au foils sequentially. The XPS data provides the signature of affectability of pyrrole sites of CuPc molecules for partial charge transfer from Cu and Ag substrates while a negligible effect on pyrrole cites resulted for Pt and Au substrates. Furthermore, the appearance of F-LUMO, a hybridized state close to the Fermi level gives confirmatory information about partial charge transfer. Contrary to the general belief that vacuum level shift caused by charge transfer can partially or totally cancel that for push back effect, our observation indicates that the partial charge transfer does not play significant role in the shift of vacuum level. The entire thickness dependent electronic energy level alignment of CuPc films on all noble metal substrates is explained in terms

Study of metal specific interaction, F-LUMO and VL shift to understand interface of CuPc thin films and noble metal surfaces

International Nuclear Information System (INIS)

Sinha, Sumona; Mukherjee, M.

2015-01-01

Graphical abstract: - Highlights: • F-LUMO, a hybridized state near E_F confirms partial charge transfer. • Non-significant role of partial charge transfer in VL shift over push back effect. • Pyrrole sites affected for partial charge transfer from Cu and Ag substrates. • Negligible effect on pyrrole cites for Pt and Au substrates. - Abstract: The performances of organic electronic devices are significantly associated with their energy level alignment at organic semiconductor/metal–electrode interfaces. The electronic character of an organic semiconducting molecular over-layer on a metal surface can vary from semiconducting to metallic, depending on the nature of the molecular orbitals with respect to the Fermi level of the electrode. The general tendency of extrapolating established models for single crystal substrates to ‘real’ device substrates is highly misleading. Hence, the importance of metal specific interaction, former lowest unoccupied molecular orbital (F-LUMO) and vacuum level (VL) shift have been investigated as a function of thickness of the deposited films by means of photoelectron spectroscopy (XPS and UPS) to understand the interface between CuPc and Cu, Ag, Pt and Au foils sequentially. The XPS data provides the signature of affectability of pyrrole sites of CuPc molecules for partial charge transfer from Cu and Ag substrates while a negligible effect on pyrrole cites resulted for Pt and Au substrates. Furthermore, the appearance of F-LUMO, a hybridized state close to the Fermi level gives confirmatory information about partial charge transfer. Contrary to the general belief that vacuum level shift caused by charge transfer can partially or totally cancel that for push back effect, our observation indicates that the partial charge transfer does not play significant role in the shift of vacuum level. The entire thickness dependent electronic energy level alignment of CuPc films on all noble metal substrates is explained in terms of a

Evolution of gettering technologies for vacuum tubes to getters for MEMS

Science.gov (United States)

Amiotti, M.

2008-05-01

Getter materials are technically proven and industrially accepted practical ways to maintain vacuum inside hermetically sealed tubes or devices to assure high reliability and long lifetime of the operating devices. The most industrially proven vacuum tube is the cathode rays tubes (CRTs), where large surfaces are available for the deposition of an evaporated barium film by a radio frequency inductive heating of a stainless steel container filled with a BaAl4 powder mixed to Ni powder. The evolution of the CRTs manufacturing technologies required also new types of barium getters able to withstand some thermal process in air without any deterioration of the evaporation characteristics. In other vacuum tubes such as traveling waves tubes, the space available for the evaporation of a barium film and the sorption capacity required to assure the vacuum for the lifetime of the devices did not allow the use of the barium film, prompting the development of sintered non evaporable getter pills that can be activated during the manufacturing process or by flowing current through an embedded resistance. The same sintered non evaporable getter pills could find usage also in evacuated parts to thermally isolate the infrared sensors for different final applications. In high energy physics particle accelerators, the getter technology moved from localized vacuum getter pumps or getter strips to a getter coating over the surface of vacuum chambers in order to guarantee a more uniform pumping speed. With the advent of solid state electronics, new challenges faced the getter technology to assure long life to vacuum or inert gas filled hermetical packages containing microelectronic devices, especially in the telecommunication and military applications. A well known problem of GaAs devices with Pd or Pt metalization is the H2 poisoning of the metal gate: to prevent this degradation a two layer getter film has been develop to absorb a large quantity of H2 per unit of getter surface. The

Electrical properties of vacuum-annealed titanium-doped indium oxide films

NARCIS (Netherlands)

Yan, L.T.; Rath, J.K.; Schropp, R.E.I.

2011-01-01

Titanium-doped indium oxide (ITiO) films were deposited on Corning glass 2000 substrates at room temperature by radio frequency magnetron sputtering followed by vacuum post-annealing. With increasing deposition power, the as-deposited films showed an increasingly crystalline nature. As-deposited

Pulsed laser deposition of YBCO films on ISD MgO buffered metal tapes

CERN Document Server

Ma, B; Koritala, R E; Fisher, B L; Markowitz, A R; Erck, R A; Baurceanu, R; Dorris, S E; Miller, D J; Balachandran, U

2003-01-01

Biaxially textured magnesium oxide (MgO) films deposited by inclined-substrate deposition (ISD) are desirable for rapid production of high-quality template layers for YBCO-coated conductors. High-quality YBCO films were grown on ISD MgO buffered metallic substrates by pulsed laser deposition (PLD). Columnar grains with a roof-tile surface structure were observed in the ISD MgO films. X-ray pole figure analysis revealed that the (002) planes of the ISD MgO films are tilted at an angle from the substrate normal. A small full-width at half maximum (FWHM) of approx 9deg was observed in the phi-scan for ISD MgO films deposited at an inclination angle of 55deg . In-plane texture in the ISD MgO films developed in the first approx 0.5 mu m from the substrate surface, and then stabilized with further increases in film thickness. Yttria-stabilized zirconia and ceria buffer layers were deposited on the ISD MgO grown on metallic substrates prior to the deposition of YBCO by PLD. YBCO films with the c-axis parallel to the...

Removing lead from metallic mixture of waste printed circuit boards by vacuum distillation: factorial design and removal mechanism.

Science.gov (United States)

Li, Xingang; Gao, Yujie; Ding, Hui

2013-10-01

The lead removal from the metallic mixture of waste printed circuit boards by vacuum distillation was optimized using experimental design, and a mathematical model was established to elucidate the removal mechanism. The variables studied in lead evaporation consisted of the chamber pressure, heating temperature, heating time, particle size and initial mass. The low-level chamber pressure was fixed at 0.1 Pa as the operation pressure. The application of two-level factorial design generated a first-order polynomial that agreed well with the data for evaporation efficiency of lead. The heating temperature and heating time exhibited significant effects on the efficiency, which was validated by means of the copper-lead mixture experiments. The optimized operating conditions within the region studied were the chamber pressure of 0.1 Pa, heating temperature of 1023 K and heating time of 120 min. After the conditions were employed to remove lead from the metallic mixture of waste printed circuit boards, the efficiency was 99.97%. The mechanism of the effects was elucidated by mathematical modeling that deals with evaporation, mass transfer and condensation, and can be applied to a wider range of metal removal by vacuum distillation. Copyright © 2013 Elsevier Ltd. All rights reserved.

Machine for extrusion under vacuum

International Nuclear Information System (INIS)

Gautier, A.

1958-01-01

In a study of the behaviour of easily oxidised metals during the extrusion process, it is first necessary to find an effective mean of fighting corrosion, since this, even when barely detectable, has an important influence on the validity of the results recorded. The neatest and also the most efficient of all the methods tried consists in creating a vacuum around the test piece. Working on this principle, and at the same time respecting the conventional rules for extrusion tests (loading the sample after stabilisation at the testing temperature, differential measurements of lengthening, etc.) we found it necessary to construct an original machine. (author) [fr

An analytical–numerical model of laser direct metal deposition track and microstructure formation

International Nuclear Information System (INIS)

Ahsan, M Naveed; Pinkerton, Andrew J

2011-01-01

Multiple analytical and numerical models of the laser metal deposition process have been presented, but most rely on sequential solution of the energy and mass balance equations or discretization of the problem domain. Laser direct metal deposition is a complex process involving multiple interdependent processes which can be best simulated using a fully coupled mass-energy balance solution. In this work a coupled analytical–numerical solution is presented. Sub-models of the powder stream, quasi-stationary conduction in the substrate and powder assimilation into the area of the substrate above the liquidus temperature are combined. An iterative feedback loop is used to ensure mass and energy balances are maintained at the melt pool. The model is verified using Ti–6Al–4V single track deposition, produced with a coaxial nozzle and a diode laser. The model predictions of local temperature history, the track profile and microstructure scale show good agreement with the experimental results. The model is a useful industrial aid and alternative to finite element methods for selecting the parameters to use for laser direct metal deposition when separate geometric and microstructural outcomes are required

An ion-sputtering gun to clean crystal surfaces in-situ in an ultra-high-vacuum electron microscope

International Nuclear Information System (INIS)

Morita, Etsuo; Takayanagi, Kunio; Kobayashi, Kunio; Yagi, Katsumichi; Honjo, Goro

1980-01-01

The design and performance of an ion-sputtering gun for cleaning crystal surfaces in-situ in an ultra-high-vacuum electron microscope are reported. The electron microscopic aspects of ion-bombardment damage to ionic magnesium oxide, covalent germanium and silicon, and metallic gold and copper crystals, and the effects of annealing after and during sputtering are described. The growth of various kinds of films deposited in-situ on crystals cleaned by ion-sputtering are described and discussed. (author)

Thin films of copper oxide and copper grown by atomic layer deposition for applications in metallization systems of microelectronic devices

Energy Technology Data Exchange (ETDEWEB)

Waechtler, Thomas

2010-05-25

Copper-based multi-level metallization systems in today's ultralarge-scale integrated electronic circuits require the fabrication of diffusion barriers and conductive seed layers for the electrochemical metal deposition. Such films of only several nanometers in thickness have to be deposited void-free and conformal in patterned dielectrics. The envisaged further reduction of the geometric dimensions of the interconnect system calls for coating techniques that circumvent the drawbacks of the well-established physical vapor deposition. The atomic layer deposition method (ALD) allows depositing films on the nanometer scale conformally both on three-dimensional objects as well as on large-area substrates. The present work therefore is concerned with the development of an ALD process to grow copper oxide films based on the metal-organic precursor bis(trin- butylphosphane)copper(I)acetylacetonate [({sup n}Bu{sub 3}P){sub 2}Cu(acac)]. This liquid, non-fluorinated {beta}-diketonate is brought to react with a mixture of water vapor and oxygen at temperatures from 100 to 160 C. Typical ALD-like growth behavior arises between 100 and 130 C, depending on the respective substrate used. On tantalum nitride and silicon dioxide substrates, smooth films and selfsaturating film growth, typical for ALD, are obtained. On ruthenium substrates, positive deposition results are obtained as well. However, a considerable intermixing of the ALD copper oxide with the underlying films takes place. Tantalum substrates lead to a fast self-decomposition of the copper precursor. As a consequence, isolated nuclei or larger particles are always obtained together with continuous films. The copper oxide films grown by ALD can be reduced to copper by vapor-phase processes. If formic acid is used as the reducing agent, these processes can already be carried out at similar temperatures as the ALD, so that agglomeration of the films is largely avoided. Also for an integration with subsequent

Thin films of copper oxide and copper grown by atomic layer deposition for applications in metallization systems of microelectronic devices

Energy Technology Data Exchange (ETDEWEB)

Waechtler, Thomas

2010-05-25

Copper-based multi-level metallization systems in today's ultralarge-scale integrated electronic circuits require the fabrication of diffusion barriers and conductive seed layers for the electrochemical metal deposition. Such films of only several nanometers in thickness have to be deposited void-free and conformal in patterned dielectrics. The envisaged further reduction of the geometric dimensions of the interconnect system calls for coating techniques that circumvent the drawbacks of the well-established physical vapor deposition. The atomic layer deposition method (ALD) allows depositing films on the nanometer scale conformally both on three-dimensional objects as well as on large-area substrates. The present work therefore is concerned with the development of an ALD process to grow copper oxide films based on the metal-organic precursor bis(trin- butylphosphane)copper(I)acetylacetonate [({sup n}Bu{sub 3}P){sub 2}Cu(acac)]. This liquid, non-fluorinated {beta}-diketonate is brought to react with a mixture of water vapor and oxygen at temperatures from 100 to 160 C. Typical ALD-like growth behavior arises between 100 and 130 C, depending on the respective substrate used. On tantalum nitride and silicon dioxide substrates, smooth films and selfsaturating film growth, typical for ALD, are obtained. On ruthenium substrates, positive deposition results are obtained as well. However, a considerable intermixing of the ALD copper oxide with the underlying films takes place. Tantalum substrates lead to a fast self-decomposition of the copper precursor. As a consequence, isolated nuclei or larger particles are always obtained together with continuous films. The copper oxide films grown by ALD can be reduced to copper by vapor-phase processes. If formic acid is used as the reducing agent, these processes can already be carried out at similar temperatures as the ALD, so that agglomeration of the films is largely avoided. Also for an integration with subsequent

Recent advances in vacuum arc ion sources

International Nuclear Information System (INIS)

Brown, I.G.; Anders, A.; Anders, S.; Dickinson, M.R.; MacGill, R.A.; Oks, E.M.

1995-07-01

Intense beams of metal ions can be formed from a vacuum arc ion source. Broadbeam extraction is convenient, and the time-averaged ion beam current delivered downstream can readily be in the tens of milliamperes range. The vacuum arc ion source has for these reasons found good application for metallurgical surface modification--it provides relatively simple and inexpensive access to high dose metal ion implantation. Several important source developments have been demonstrated recently, including very broad beam operation, macroparticle removal, charge state enhancement, and formation of gaseous beams. The authors have made a very broad beam source embodiment with beam formation electrodes 50 cm in diameter, producing a beam of width ∼35 cm for a nominal beam area of ∼1,000 cm 2 , and a pulsed Ti beam current of about 7 A was formed at a mean ion energy of ∼100 keV. Separately, they've developed high efficiency macroparticle-removing magnetic filters and incorporated such a filter into a vacuum arc ion source so as to form macroparticle-free ion beams. Jointly with researchers at the High Current Electronics Institute at Tomsk, Russia, and the Gesellschaft fuer Schwerionenforschung at Darmstadt, Germany, they've developed a compact technique for increasing the charge states of ions produced in the vacuum arc plasma and thus providing a simple means of increasing the ion energy at fixed extractor voltage. Finally, operation with mixed metal and gaseous ion species has been demonstrated. Here, they briefly review the operation of vacuum marc ion sources and the typical beam and implantation parameters that can be obtained, and describe these source advances and their bearing on metal ion implantation applications

Metals in bulk deposition and surface waters at two upland locations in northern England

Energy Technology Data Exchange (ETDEWEB)

Lawlor, A.J.; Tipping, E

2003-02-01

Surface water concentrations of potentially-toxic metals depend upon atmospheric deposition and catchment biogeochemical processes. - Concentrations of aluminium and minor metals (Mn, Ni, Cu, Zn, Sr, Cd, Ba, Pb) were measured in precipitation and surface water at two upland locations (Upper Duddon Valley, UDV; Great Dun Fell, GDF) in northern England for 1 year commencing April 1998. At both locations, the loads in bulk precipitation were at the lower ends of ranges reported for other rural and remote sites, for the period 1985-1995. The deposited metals were mostly in the dissolved form, and their concentrations tended to be greatest when rainfall volumes were low. The concentrations of Cu, Zn and Pb in deposition were correlated (r{sup 2}{>=}0.40) with concentrations of non-marine sulphate. Three streams, ranging in mean pH from 5.07 to 7.07, and with mean concentrations of dissolved organic carbon (DOC) <1 mg l{sup -1}, were monitored at UDV, and two pools (mean pH 4.89 and 6.83, mean DOC 22 and 15 mg l{sup -1}) at GDF. Aluminium and the minor metals were mainly in the dissolved form, and in the following ranges (means of 49-51 samples, {mu}g l{sup -1}): Al 36-530, Mn 4.4-36, Ni 0.26-2.8, Cu 0.25-1.7, Zn 2.1-30, Cd 0.03-0.16, Ba 1.9-140, Pb 0.10-4.5. Concentrations were generally higher at GDF. Differences in metal concentrations between the two locations and between waters at each location, and temporal variations in individual waters, can be explained qualitatively in terms of sorption to solid-phase soil organic matter and mineral surfaces, complexation and transport by DOC, and chemical weathering. The UDV catchments are sinks for Pb and sources of Al, Mn, Sr, Cd and Ba. The GDF catchments are sources of Al, Mn, Ni, Zn, Sr, Cd and Ba. Other metals measured at the two locations are approximately in balance. Comparison of metal:silicon ratios in the surface waters with values for silicate rocks indicates enrichment of Ni and Cu, and substantial enrichment of

Natural reducing agents for electroless nanoparticle deposition: Mild synthesis of metal/carbon nanostructured microspheres

International Nuclear Information System (INIS)

Duffy, Paul; Reynolds, Lyndsey A.; Sanders, Stephanie E.; Metz, Kevin M.; Colavita, Paula E.

2013-01-01

Composite materials are of interest because they can potentially combine the properties of their respective components in a manner that is useful for specific applications. Here, we report on the use of coffee as a low-cost, green reductant for the room temperature formation of catalytically active, supported metal nanoparticles. Specifically, we have leveraged the reduction potential of coffee in order to grow Pd and Ag nanoparticles at the surface of porous carbon microspheres synthesized via ultraspray pyrolysis. The metal nanoparticle-on-carbon microsphere composites were characterized using scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD) and thermal gravimetric analysis (TGA). To demonstrate the catalytic activity of Pd/C and Ag/C materials, Suzuki coupling reactions and nitroaromatic reduction reactions were employed, respectively. - Highlights: • Natural reductants were used as green electroless deposition reagents. • Room temperature synthesis of supported Ag and Pd nanoparticles was achieved. • Carbon porous microspheres were used as supports. • Synthesis via natural reductants yielded catalytically active nanoparticles.

dc breakdown conditioning and breakdown rate of metals and metallic alloys under ultrahigh vacuum

Directory of Open Access Journals (Sweden)

A. Descoeudres

2009-03-01

Full Text Available The rf accelerating structures of the Compact Linear Collider (CLIC require a material capable of sustaining high electric field with a low breakdown rate and low induced damage. Because of the similarity of many aspects of dc and rf breakdown, a dc breakdown study is underway at CERN in order to test candidate materials and surface preparations, and have a better understanding of the breakdown mechanism under ultrahigh vacuum in a simple setup. Conditioning speeds and breakdown fields of several metals and alloys have been measured. The average breakdown field after conditioning ranges from 100  MV/m for Al to 850  MV/m for stainless steel, and is around 170  MV/m for Cu which is the present base-line material for CLIC structures. The results indicate clearly that the breakdown field is limited by the cathode. The presence of a thin cuprous oxide film at the surface of copper electrodes significantly increases the breakdown field. On the other hand, the conditioning speed of Mo is improved by removing oxides at the surface with a vacuum heat treatment, typically at 875°C for 2 hours. Surface finishing treatments of Cu samples only affect the very first breakdowns. More generally, surface treatments have an effect on the conditioning process itself, but not on the average breakdown field reached after the conditioning phase. In analogy to rf, the breakdown probability has been measured in dc with Cu and Mo electrodes. The dc data show similar behavior as rf as a function of the applied electric field.

Deposition and Characterization of Thin Films on Metallic Substrates

Science.gov (United States)

Gatica, Jorge E.

2005-01-01

A CVD method was successfully developed to produce conversion coatings on aluminum alloys surfaces with reproducible results with a variety of precursors. A well defined protocol to prepare the precursor solutions formulated in a previous research was extended to other additives. It was demonstrated that solutions prepared following such a protocol could be used to systematically generate protective coatings onto aluminum surfaces. Experiments with a variety of formulations revealed that a refined deposition protocol yields reproducible conversion coatings of controlled composition. A preliminary correlation between solution formulations and successful precursors was derived. Coatings were tested for adhesion properties enhancement for commercial paints. A standard testing method was followed and clear trends were identified. Only one precursors was tested systematically. Anticipated work on other precursors should allow a better characterization of the effect of intermetallics on the production of conversion/protective coatings on metals and ceramics. The significance of this work was the practical demonstration that chemical vapor deposition (CVD) techniques can be used to systematically generate protective/conversion coating on non-ferrous surfaces. In order to become an effective approach to replace chromate-based pre- treatment processes, namely in the aerospace or automobile industry, the process parameters must be defined more precisely. Moreover, the feasibility of scale-up designs necessitates a more comprehensive characterization of the fluid flow, transport phenomena, and chemical kinetics interacting in the process. Kinetic characterization showed a significantly different effect of magnesium-based precursors when compared to iron-based precursors. Future work will concentrate on refining the process through computer simulations and further experimental studies on the effect of other transition metals to induce deposition of conversion/protective films

Deposition of deuterium and metals on divertor tiles in the DIII-D tokamak

International Nuclear Information System (INIS)

Walsh, D.S.; Doyle, B.L.; Jackson, G.L.

1991-01-01

Hydrogen recycling and impurity influx are important issues in obtaining high confinement discharges in the D3-D tokamak. To reduce metallic impurities in D3-D, 40% of the wall area, including the highest heat flux zones, have been covered with graphite tiles. However erosion, redeposition and hydrogen retention in the tiles, as well as metal transport from the remaining Inconel walls can lead to enhanced recycling and impurity influx. Hydrogen and metal retention in divertor floor tiles have been measured using external ion beam analysis techniques following four campaigns where tiles were exposed to several thousand tokamak discharges. The areal density of deuterium retained following exposure to tokamak plasmas was measured with external nuclear reaction analysis. External proton-induced x-ray emission analysis was used to measure the areal densities of metallic impurities deposited upon the divertor tiles either by sputtering of metallic components during discharges or as contamination during tile fabrication. Measurements for both deuterium and metallic impurities were taken on both the tile surfaces which face the operating plasma and the surfaces on the side of the tiles which form the small gaps separating each of the tiles in the divertor. The highest areal densities of both deuterium and metals were found on the plasma-facing surface near the inner strike point region of each set of divertor tiles. Significant deposits, extending as fast a 1 cm from the plasma-facing and containing up to forty percent of the total divertor deposition, were also observed on the gap-forming surfaces of the tiles

Mechanical properties of vapor-deposited thin metallic films: a status report

International Nuclear Information System (INIS)

Adler, P.H.

1982-01-01

The mechanical properties of vapor-deposited thin metallic films are being studied in conjunction with the target fabrication group associated with the laser-fusion energy program. The purpose of the work is to gain an understanding as to which metals are structurally best suited to contain a glass microsphere filled with deuterium-tritium (D-T) gas at large internal pressures

Vacuum and ultravacuum physics and technology

CERN Document Server

Bello, Igor

2018-01-01

Vacuum technology has enormous impact on human life in many aspects and fields, such as metallurgy, material development and production, food and electronic industry, microelectronics, device fabrication, physics, materials science, space science, engineering, chemistry, technology of low temperature, pharmaceutical industry, and biology. All decorative coatings used in jewelries and various daily products—including shiny decorative papers, the surface finish of watches, and light fixtures—are made using vacuum technological processes. Vacuum analytical techniques and vacuum technologies are pillars of the technological processes, material synthesis, deposition, and material analyses—all of which are used in the development of novel materials, increasing the value of industrial products, controlling the technological processes, and ensuring the high product quality. Based on physical models and calculated examples, the book provides a deeper look inside the vacuum physics and technology.

Risk assessment of metals in road-deposited sediment along an urban–rural gradient

International Nuclear Information System (INIS)

Zhao, Hongtao; Li, Xuyong

2013-01-01

We applied the traditional risk assessment methods originally designed for soils and river sediments to evaluation of risk associated with metals in road-deposited sediment (RDS) along an urban–rural gradient that included central urban (UCA), urban village (UVA), central suburban county (CSA), rural town (RTA), and rural village (RVA) areas in the Beijing metropolitan region. A new indicator RI RDS was developed which integrated the RDS characteristics of mobility, grain size and amount with the potential ecological risk index. The risk associated with metals in RDS in urban areas was generally higher than that in rural areas based on the assessment using traditional methods, but the risk was higher in urban and rural village areas than the areas with higher administration units based on the indicator RI RDS . These findings implied that RDS characteristics variation with the urban–rural gradient must be considered in metal risk assessment and RDS washoff pollution control. Highlights: ► Spatial pattern of metal risk level associated with road-deposited sediment (RDS) along urban–rural gradients varied. ► Risk level of metals changed significantly when grain size was considered. ► A new index integrating RDS characteristics and potential ecological risk was developed. ► Results from the new index were improved relative to those of traditional assessment methods. -- A new index integrating road-deposited sediment characteristics and potential ecological risk was developed to assess metal risk along the urban–rural gradient

Co3O4 protective coatings prepared by Pulsed Injection Metal Organic Chemical Vapour Deposition

DEFF Research Database (Denmark)

Burriel, M.; Garcia, G.; Santiso, J.

2005-01-01

of deposition temperature. Pure Co3O4 spinel structure was found for deposition temperatures ranging from 360 to 540 degreesC. The optimum experimental parameters to prepare dense layers with a high growth rate were determined and used to prepare corrosion protective coatings for Fe-22Cr metallic interconnects......Cobalt oxide films were grown by Pulsed Injection Metal Organic Chemical Vapour Deposition (PI-MOCVD) using Co(acac)(3) (acac=acetylacetonate) precursor dissolved in toluene. The structure, morphology and growth rate of the layers deposited on silicon substrates were studied as a function......, to be used in Intermediate Temperature Solid Oxide Fuel Cells. (C) 2004 Elsevier B.V. All rights reserved....

Feasibility study of vacuum technology integrated fused deposition ...

African Journals Online (AJOL)

vacuum pump connected will absorb the air inside the chamber until desire pressure while printing object. Mitutoyo SJ-301 portable surface roughness tester and optical microscope used to analyze the quality of surface finish. Result reveal with ...

Formation of centimeter Fe-based bulk metallic glasses in low vacuum environment

Energy Technology Data Exchange (ETDEWEB)

Pan Jie; Chen Qi; Li Ning [State Key Lab of Materials Processing and Mould Technology, Department of Materials Science and Technology, Huazhong University of Science and Technology, 430074 Wuhan (China); Liu Lin [State Key Lab of Materials Processing and Mould Technology, Department of Materials Science and Technology, Huazhong University of Science and Technology, 430074 Wuhan (China)], E-mail: lliu2000@public.wh.hb.cn

2008-09-08

The formation of a Fe{sub 43.7}Co{sub 7.3}Cr{sub 14.7}Mo{sub 12.6}C{sub 15.5}B{sub 4.3}Y{sub 1.9} bulk metallic glass (BMG) was attempted in low vacuum environment and in air using commercial raw materials. The glass forming ability of the Fe-based alloys was studied by X-ray diffraction (XRD), differential scanning calorimetry (DSC) and differential thermal analyzer (DTA). It was found that cylindric rods with diameters ranging from 10 mm to 5 mm could be successfully fabricated by copper-mold casting in the pressures from 1.5 Pa to 10{sup 5} Pa (10{sup 5} Pa = 1 atm). All BMGs exhibit a distinct glass transition and wide supercooled liquid region. The preparation condition seems not significantly affected by the thermodynamic parameters of BMG, such as supercooled liquid region, glass transition temperature and melting process. The oxygen content of the alloys prepared in different vacuum conditions was measured by a LECO oxygen analyzer, which revealed that the oxygen content was less than 100 ppm for all BMGs prepared, even in air. The good glass forming ability and excellent oxidation resistance for the present Fe-based alloy are discussed.

Design and fabrication of a chamber for the deposit of thin films by laser ablation

International Nuclear Information System (INIS)

Chirino O, S.; Escobar A, I.; Camps C, E.; Garcia E, J.I.

2000-01-01

The laser ablation technique is an alternative for the obtention of thin films which is less expensive, more reliable, efficient and with some advantages with respect to conventional processes. On of the most important components which forms a laser ablation system is the vacuum chamber, that has as general purposes the following: a) To carry out studies about plasma such as optical emission spectroscopy and measurements by deflectometry. b) To carry out an In situ monitoring about the film growth through the reflectivity measurements of the combination substrate-film. c) To deposit thin films of different materials such as oxides, carbon, metals, etc. In this work it is showed how the vacuum chamber was designed and made to perform the store of thin films by laser ablation and for characterising the formed plasma as a result of the ablation process. The chamber design was enough versatile that will allow to add it more accessory just making it simple modifications. Its cost was very cheap more or less one twentieth of a commercial chamber. (Author)

Physical-mechanical properties of Ti-Al-N films, deposited from mixed two-component vacuum arc plasma stream

International Nuclear Information System (INIS)

Aksenov, D.S.; Aksenov, I.I.; Luchaninov, A.A.; Reshetnyak, E.N.; Strel'nitskij, V.E.; Tolmacheva, G.N.; Yurkov, S.A.

2011-01-01

Ti-Al-N films were obtained by vacuum arc system equipped with two-channel T-shaped magnetic filter. The films were deposited by mixing of filtered plasma streams from two sources with cathodes made of aluminium and titanium in nitrogen environment. An influence of aluminium concentration and substrate bias on structure, hardness and elastic modulus of deposited films was studied by X-ray diffraction analysis and nanoindentation techniques. It was found that coatings with aluminium content in range from 13 to 47 at. % are characterized by cubic nitride based on TiN with NaCl structure. An increase of Al content to 71 at. % leads to the formation of hexagonal AlN-based nitride with wurtzite-like structure. Maximum hardness of 35 GPa is observed in films with 47 at. % aluminium concentration and -100 V substrate bias. Elastic modulus falls off along with increase of Al content and negative substrate bias.

Reconstructing temporal trends in heavy metal deposition: Assessing the value of herbarium moss samples

Energy Technology Data Exchange (ETDEWEB)

Shotbolt, L. [Geography Department, Queen Mary, University of London, London, E1 4NS (United Kingdom)]. E-mail: l.shotbolt@qmul.ac.uk; Bueker, P. [Stockholm Environment Institute, University of York, Heslington, YO10 5DD (United Kingdom)]. E-mail: pb25@york.ac.uk; Ashmore, M.R. [Environment Department, University of York, Heslington, YO10 5DD (United Kingdom)]. E-mail: ma512@york.ac.uk

2007-05-15

The use of the herbarium moss archive for investigating past atmospheric deposition of Ni, Cu, Zn, As, Cd and Pb was evaluated. Moss samples from five UK regions collected over 150 years were analysed for 26 elements using ICP-MS. Principal components analysis identified soil as a significant source of Ni and As and atmospheric deposition as the main source of Pb and Cu. Sources of Zn and Cd concentrations were identified to be at least partly atmospheric, but require further investigation. Temporal and spatial trends in metal concentrations in herbarium mosses showed that the highest Pb and Cu levels are found in Northern England in the late 19th century. Metal concentrations in herbarium moss samples were consistently higher than those in mosses collected from the field in 2000. Herbarium moss samples are concluded to be a useful resource to contribute to reconstructing trends in Pb and Cu deposition, but not, without further analysis, for Cd, Zn, As and Ni. - Herbarium moss samples can contribute to the reconstruction of past heavy metal deposition.

Reconstructing temporal trends in heavy metal deposition: Assessing the value of herbarium moss samples

International Nuclear Information System (INIS)

Shotbolt, L.; Bueker, P.; Ashmore, M.R.

2007-01-01

The use of the herbarium moss archive for investigating past atmospheric deposition of Ni, Cu, Zn, As, Cd and Pb was evaluated. Moss samples from five UK regions collected over 150 years were analysed for 26 elements using ICP-MS. Principal components analysis identified soil as a significant source of Ni and As and atmospheric deposition as the main source of Pb and Cu. Sources of Zn and Cd concentrations were identified to be at least partly atmospheric, but require further investigation. Temporal and spatial trends in metal concentrations in herbarium mosses showed that the highest Pb and Cu levels are found in Northern England in the late 19th century. Metal concentrations in herbarium moss samples were consistently higher than those in mosses collected from the field in 2000. Herbarium moss samples are concluded to be a useful resource to contribute to reconstructing trends in Pb and Cu deposition, but not, without further analysis, for Cd, Zn, As and Ni. - Herbarium moss samples can contribute to the reconstruction of past heavy metal deposition

Topography evolution of rough-surface metallic substrates by solution deposition planarization method

Science.gov (United States)

Chu, Jingyuan; Zhao, Yue; Liu, Linfei; Wu, Wei; Zhang, Zhiwei; Hong, Zhiyong; Li, Yijie; Jin, Zhijian

2018-01-01

As an emerging technique for surface smoothing, solution deposition planarization (SDP) has recently drawn more attention on the fabrication of the second generation high temperature superconducting (2G-HTS) tapes. In our work, a number of amorphous oxide layers were deposited on electro-polished or mirror-rolled metallic substrates by chemical solution route. Topography evolution of surface defects on these two types of metallic substrates was thoroughly investigated by atomic force microscopy (AFM). It was showed that root mean square roughness values (at 50 × 50 μm2 scanning scale) on both rough substrates reduced to ∼5 nm after coating with SDP-layer. The smoothing effect was mainly attributed to decrease of the depth at grain boundary grooving on the electro-polished metallic substrate. On the mirror-rolled metallic substrates, the amplitude and frequency of the height fluctuation perpendicular to the rolling direction were gradually reduced as depositing more numbers of SDP-layer. A high Jc value of 4.17 MA cm-2 (at 77 K, s.f.) was achieved on a full stack of YBCO/CeO2/IBAD-MgO/SDP-layer/C276 sample. This study enhanced understanding of the topography evolution on the surface defects covered by the SDP-layer, and demonstrated a low-cost route for fabricating IBAD-MgO based YBCO templates with a simplified architecture.

Application of laser assisted cold spraying process for metal deposition

CSIR Research Space (South Africa)

Tlotleng, Monnamme

2014-02-01

Full Text Available Laser assisted cold spraying (LACS) process is a hybrid technique that uses laser and cold spray to deposit solid powders on metal substrates. For bonding to occur, the particle velocities must be supersonic which are achieved by entraining...

Role of calcium-depositing bacteria Agrobacterium tumefaciens and its influence on corrosion of different engineering metals used in cooling water system.

Science.gov (United States)

Narenkumar, Jayaraman; Sathishkumar, Kuppusamy; Selvi, Adikesavan; Gobinath, Rajagopalan; Murugan, Kadarkarai; Rajasekar, Aruliah

2017-12-01

The present investigation deals with the role of calcium-depositing bacterial community on corrosion of various engineering metals, namely, brass alloy (BS), copper (Cu), stainless steel (SS) and mild steel (MS). Based on the corrosion behavior, Agrobacterium tumefaciens EN13, an aerobic bacterium is identified as calcium-depositing bacteria on engineering metals. The results of the study are supported with biochemical characterization, 16S rRNA gene sequencing, calcium quantification, weight loss, electrochemical (impedance and polarization) and surface analysis (XRD and FTIR) studies. The calcium quantification study showed carbonate precipitation in abiotic system/biotic system as 50 and 700 ppm, respectively. FTIR results too confirmed the accumulation of calcium deposits from the environment on the metal surface by EN13. Electrochemical studies too supported the corrosion mechanism by showing a significant increase in the charge transfer resistance ( R ct ) of abiotic system (44, 33.6, 45, 29.6 Ω cm 2 ) than compared to biotic system (41, 10.1 29 and 25 Ω cm 2 ). Hence, the outcome of the present study confirmed the enhanced bioaccumulation behavior of calcium by the strain, EN13.

Stiffness management of sheet metal parts using laser metal deposition

Science.gov (United States)

Bambach, Markus; Sviridov, Alexander; Weisheit, Andreas

2017-10-01

Tailored blanks are established solutions for the production of load-adapted sheet metal components. In the course of the individualization of production, such semi-finished products are gaining importance. In addition to tailored welded blanks and tailored rolled blanks, patchwork blanks have been developed which allow a local increase in sheet thickness by welding, gluing or soldering patches onto sheet metal blanks. Patchwork blanks, however, have several limitations, on the one hand, the limited freedom of design in the production of patchwork blanks and, on the other hand, the fact that there is no optimum material bonding with the substrate. The increasing production of derivative and special vehicles on the basis of standard vehicles, prototype production and the functionalization of components require solutions with which semi-finished products and sheet metal components can be provided flexibly with local thickenings or functional elements with a firm metallurgical bond to the substrate. An alternative to tailored and patchwork blanks is, therefore, a free-form reinforcement applied by additive manufacturing via laser metal deposition (LMD). By combining metal forming and additive manufacturing, stiffness can be adapted to the loads based on standard components in a material-efficient manner and without the need to redesign the forming tools. This paper details a study of the potential of stiffness management by LMD using a demonstrator part. Sizing optimization is performed and part distortion is taken into account to find an optimal design for the cladding. A maximum stiffness increase of 167% is feasible with only 4.7% additional mass. Avoiding part distortion leads to a pareto-optimal design which achieves 95% more stiffness with 6% added mass.

Chromium depletion from stainless steels during vacuum annealing

International Nuclear Information System (INIS)

Smith, A.F.; Hales, R.

1977-01-01

During selective chromium oxidation of stainless steels the changes in chromium concentration at the metal surface and in the metal have an important bearing on the overall oxidation performance. It has been proposed that an analogue of chromium behaviour during selective oxidation is obtained from volatilisation of chromium during high temperature vacuum annealing. In the present report the evaporation of chromium from 316 type of steel, vacuum annealed at 1,000 0 C, has been investigated by means of energy dispersive X-ray analysis and by neutron activation analysis. It was established that chromium loss from austenitic stainless steels is rate controlled by interdiffusion in the alloy. As predicted the chromium concentration at the metal surface decreased with increasing vacuum annealing time. The chromium depletion profile in the metal was in good agreement with the previously derived model apart from an anomalous region near the surface. Here the higher resolution of the neutron activation technique indicated a zone within approximately 2μm of the surface where the chromium concentration decreased more steeply than expected. (orig.) [de

Centrifugal vacuum casting for fuel cladding tube blanks

International Nuclear Information System (INIS)

Zelenskii, V.F.; Neklyudov, I.M.; Chernyi, B.P.; Zeidlits, M.P.; Vanzha, A.F.; Rubashko, V.G.; Ryabchikov, L.N.; Smirnov, Y.K.; Bespalova, V.R.; Mashkarova, V.T.; Rybal'chenko, N.D.

1990-01-01

An advanced technique for making tube blanks with an acceptable level of nonmetallic inclusions is vacuum induction melting combined with centrifugal casting, as the latter gives a cylindrical casting having an axial hole, while the cast metal has elevated density and contains fewer nonmetallic inclusions than does the metal cast in a stationary mold. The reduction in the nonmetallic inclusions occurs because of increased rates of floating up in the rotating mold on account of the centrifugal force and the rejection to the inner surface. One can choose the parameters such as the pouring speed, rotational speed, mold cooling, and liquid-metal temperature and can introduce a deoxidizer to remove the nonmetallic inclusions or reduce the grain size of them and produce an appropriate cast structure and obtain a metal whose quality is the same as that on vacuum induction melting with secondary arc remelting. For these purposes, the authors have developed centrifugal-casting machines for use under vacuum or in inert gases with horizontal and vertical mold rotation axes

Laser deposition rates of thin films of selected metals and alloys

DEFF Research Database (Denmark)

Cazzaniga, Andrea Carlo; Canulescu, Stela; Schou, Jørgen

Thin films of Cu, Zn and Sn as well as mixtures of these elements have been produced by Pulsed Laser Deposition (PLD). The deposition rate of single and multicomponent metallic targets was determined. The strength of PLD is that the stoichiometry of complex compounds, even of complicated alloys...... or metal oxides, can be preserved from target to film. We apply this technique to design films of a mixture of Cu, Zn and Sn, which are constituents of the chalcogenide CZTS, which has a composition close to Cu2ZnSnS4. This compound is expected to be an important candidate for absorbers in new solar cells...... for alloys of the different elements as well as compounds with S will be presented....

Influences of arc current on composition and properties of MgO thin films prepared by cathodic vacuum arc deposition

International Nuclear Information System (INIS)

Zhu Daoyun; Zheng Changxi; Wang Mingdong; Liu Yi; Chen Dihu; He Zhenhui; Wen Lishi; Cheung, W.Y.

2010-01-01

MgO thin films with high optical transmittances (more than 90%) were prepared by cathodic vacuum arc deposition technique. With the increase of arc current from 40 to 80 A, the deposition pressure decreases and the film thickness increases; the atomic ratio of Mg/O in MgO thin films (obtained by RBS) increases from 0.97 to 1.17, giving that deposited at 50 A most close to the stoichiometric composition of the bulk MgO; the grains of MgO thin films grow gradually as shown in SEM images. XRD patterns show that MgO (1 1 0) orientation is predominant for films prepared at the arc currents ranged from 50 to 70 A. The MgO (1 0 0) orientation is much enhanced and comparable to that of MgO (1 1 0) for films prepared at the arc current of 80 A. The secondary electron emission coefficient of MgO thin film increases with arc current ranged from 50 to 70 A.

Incidence Angle Effect of Energetic Carbon Ions on Deposition Rate, Topography, and Structure of Ultrathin Amorphous Carbon Films Deposited by Filtered Cathodic Vacuum Arc

KAUST Repository

Wang, N.

2012-07-01

The effect of the incidence angle of energetic carbon ions on the thickness, topography, and structure of ultrathin amorphous carbon (a-C) films synthesized by filtered cathodic vacuum arc (FCVA) was examined in the context of numerical and experimental results. The thickness of a-C films deposited at different incidence angles was investigated in the light of Monte Carlo simulations, and the calculated depth profiles were compared with those obtained from high-resolution transmission electron microscopy (TEM). The topography and structure of the a-C films were studied by atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS), respectively. The film thickness decreased with the increase of the incidence angle, while the surface roughness increased and the content of tetrahedral carbon hybridization (sp 3) decreased significantly with the increase of the incidence angle above 45° , measured from the surface normal. TEM, AFM, and XPS results indicate that the smoothest and thinnest a-C films with the highest content of sp 3 carbon bonding were produced for an incidence angle of 45°. The findings of this study have direct implications in ultrahigh-density magnetic recording, where ultrathin and smooth a-C films with high sp 3 contents are of critical importance. © 2012 IEEE.

On the properties of nanocomposite amorphous carbon films prepared by off-plane double bend filtered cathodic vacuum arc

International Nuclear Information System (INIS)

Tay, B.K.; Zhang, P.

2002-01-01

It is known to deposit hard thin films, such as tetrahedral amorphous carbon (ta-C), using a filtered cathode vacuum arc (FCVA). These ta-C films have interesting and useful properties because of the high sp 3 fraction of carbon atoms (up to 87%) in the film. However, the high internal stress in the films can limit their applications as the film may flake away from the substrate. In order to reduce the internal stress of the ta-C films and in an attempt to improve adhesion of thick films of this type, growth modifications such as incorporating metal into the ta-C films have been carried out. Nanocomposite amorphous carbon films were deposited by FCVA technique using metal-carbon composite target. Atomic force microscopy, Raman, and X-ray photoelectron spectroscopy were used to characterize the morphology and structure of the films. Nanoindenter and surface profilometer were used to determine the hardness, Young's modulus, and internal stress. The same metal composition targets for different elements results in different metal composition in the corresponding nanocomposite amorphous carbon films. We attribute this observation to the dynamic balance deposition effect of the FCVA deposition process. The influence of the type of metallic elements and its composition in the films on the structural, mechanical properties, surface energy and field emission (FE) performance was studied. The incorporation of metal into the films results in the decrease of sp 3 fraction, internal stress in the films, but the hardness and Young's modulus remains at high level. The surface energy of the films increases with incorporating Ni atoms, but decreases after incorporating Fe and Al atoms into the films. After heat-treatment, the incorporation of metal into ta-C films can greatly improve the FE performance

Infiltration processing of metal matrix composites using coated ceramic particulates

Science.gov (United States)

Leon-Patino, Carlos Alberto

2001-07-01

A new process was developed to fabricate particulate metal matrix composites (MMCs). The process involves three steps: (1) modifying the particulate surface by metal coating, (2) forming a particulate porous compact; and (3) introducing metal into the channel network by vacuum infiltration. MMCs with different reinforcements, volume fractions, and sizes can be produced by this technique. Powders of alumina and silicon carbide were successfully coated with nickel and copper in preparation for infiltration with molten aluminum. Electroless Ni and Cu deposition was used since it enhances the wettability of the reinforcements for composite fabrication. While Cu deposits were polycrystalline, traces of phosphorous co-deposited from the electroless bath gave an amorphous Ni-P coating. The effect of metal coating on wetting behavior was evaluated at 800°C on plain and metal-coated ceramic plates using a sessile drop technique. The metallic films eliminated the non-wetting behavior of the uncoated ceramics, leading to equilibrium contact angles in the order of 12° and below 58° for Ni and Cu coated ceramics, respectively. The spreading data indicated that local diffusion at the triple junction was the governing mechanism of the wetting process. Precipitation of intermetallic phases in the drop/ceramic interface delayed the formation of Al4C3. Infiltration with molten Al showed that the coated-particulates are suitable as reinforcing materials for fabricating MMCs, giving porosity-free components with a homogeneously distributed reinforcing phase. The coating promoted easy metal flow through the preform, compared to the non-infiltration behavior of the uncoated counterparts. Liquid state diffusion kinetics due to temperature dependent viscosity forces controlled the infiltration process. Microstructural analysis indicated the formation of intermetallic phases such as CuAl 2, in the case of Cu coating, and Ni2Al3 and NiAl 3 when Ni-coated powders were infiltrated. The

Self-organized formation of metal-carbon nanostructures by hyperthermal ion deposition

Energy Technology Data Exchange (ETDEWEB)

Hannstein, I.K.

2006-04-26

The quasi-simultaneous deposition of mass-selected hyperthermal carbon and metal ions results in a variety of interesting film morphologies, depending on the metal used and the deposition conditions. The observed features are of the order of a few nanometres and are therefore interesting for future potential applications in the various fields of nanotechnology. The present study focuses on the structural analysis of amorphous carbon films containing either copper, silver, gold, or iron using amongst others Rutherford Backscattering Spectroscopy, High Resolution Transmission Electron Microscopy, and Energy Dispersive X-Ray Spectroscopy. The film morphologies found are as follows: copper-containing films consist of copper nanoclusters with sizes ranging from about 3 to 9 nm uniformly distributed throughout the amorphous carbon matrix. The cluster size hereby rises with the copper content of the films. The silver containing films decompose into a pure amorphous carbon film with silver agglomerates at the surface. Both, the gold- and the iron-containing films show a multilayer structure of metal-rich layers with higher cluster density separated by metal-depleted amorphous carbon layers. The layer distances are of the order of up to 15 nm in the case of gold-carbon films and 7 nm in the case of iron-carbon films. The formation of theses different structures cannot be treated in the context of conventional self-organization mechanisms basing upon thermal diffusion and equilibrium thermodynamics. Instead, an ion-induced atomic transport, sputtering effects, and the stability of small metal clusters were taken into account in order to model the structure formation processes. A similar multilayer morphology was recently also reported in the literature for metal-carbon films grown by magnetron sputtering techniques. In order to investigate, whether the mechanisms are the same as in the case of the ion beam deposited films described above, first experiments were conducted

Deposition of deuterium and metals on divertor tiles in the DIII--D tokamak

International Nuclear Information System (INIS)

Walsh, D.S.; Doyle, B.L.; Jackson, G.L.

1992-01-01

Hydrogen recycling and impurity influx are important issues in obtaining high confinement discharges in the DIII--D tokamak. To reduce metallic impurities in DIII--D, 40% of the wall area, including the highest heat flux zones, have been covered with graphite tiles. However, erosion, redeposition, and hydrogen retention in the tiles, as well as metal transport from the remaining Inconel walls, can lead to enhanced recycling and impurity influx. Hydrogen and metal retention in divertor floor tiles have been measured using external ion beam analysis techniques following four campaigns where tiles were exposed to several thousand tokamak discharges. The areal density of deuterium retained following exposure to tokamak plasmas was measured with external nuclear reaction analysis. External proton-induced x-ray emission analysis was used to measure the areal densities of metallic impurities deposited upon the divertor tiles either by sputtering of metallic components during discharges or as contamination during tile fabrication. Measurements for both deuterium and metallic impurities were taken on both the tile surfaces which face the operating plasma and the surfaces on the sides of the tiles which form the small gaps separating each of the tiles in the divertor. The highest areal densities of both deuterium (from 2 to 8 x 10 18 atoms/cm 2 ) and metals (from 0.2 to 1 x 10 18 atoms/cm 2 ) were found on the plasma-facing surface near the inner strike point region of each set of divertor tiles. Significant deposits, extending as far as 1 cm from the plasma-facing surface and containing up to 40% of the total divertor deposition, were also observed on the gap-forming surfaces of the tiles

A contribution to the study of metal-ceramic bonding by direct vacuum brazing with reactive metals

International Nuclear Information System (INIS)

Guimaraes, A.S.

1988-01-01

Wettability and bonding tests were utilized to evaluate the behaviour of various specials alloys, for work at high temperature under vacuum, for the inter-bonding of silicon carbide, alumina ceramic, graphite (for electrical applications) and petroleum coke and their joining with themselves as the metals titanium, molybdenum, nickel and copper. The joints exhibiting effective bonding were investigated by means of optical microscopy, scanning electron microscopy and X-rays diffraction. Elemental mapping of the constituents and quantitative chemical microanalysis were also undertaken, via the energy dispersive analysis of X-rays (SEM/EDS). On the basis of the results the possible mechanisms of bond-formation have been discussed. It was verified that: a) of the filler metals studied, those which exhibited effective wettability on all the above materials were: 49Cu-49Ti-2Be, Zircaloy4-5Be and a commercial alloy Ticusil, which consisted of a Cu-Ag eutectic with a small addition of pure Ti, of nominal composition 26.7Cu-68.8Ag-4.5Ti; b) the alloys with high levels of reactive metals such as Ti and Zr tended to form low ductility bonds due to the formation of hard, brittle phases; c) the copper suffered pronounced erosion when in direct contact with alloys of high Ti and Zr contents, due to the formation of phases whose melting points were below the brazing temperature of those materials; e) the compounds detected as reaction products were identified as, TiC in the samples rich in carbon, such as the SiC ceramic and graphite joints, or the oxides Cu2Ti2O5 and Cu3TiO4 in the bonding of alumina to alloys including Ti in their composition or in that of the filler metal, proving that the effectiveness of the bond is dependent upon an initial and indispensable chemical bonding. (author)

Chemical vapor deposition of refractory metals and ceramics III

International Nuclear Information System (INIS)

Gallois, B.M.; Lee, W.Y.; Pickering, M.A.

1995-01-01

The papers contained in this volume were originally presented at Symposium K on Chemical Vapor Deposition of Refractory Metals and Ceramics III, held at the Fall Meeting of the Materials Research Society in Boston, Massachusetts, on November 28--30, 1994. This symposium was sponsored by Morton International Inc., Advanced Materials, and by The Department of Energy-Oak Ridge National Laboratory. The purpose of this symposium was to exchange scientific information on the chemical vapor deposition (CVD) of metallic and ceramic materials. CVD technology is receiving much interest in the scientific community, in particular, to synthesize new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), ''smart'' material structures and nanocomposites are some examples of new classes of materials being produced via CVD. As rapid progress is being made in many interdisciplinary research areas, this symposium is intended to provide a forum for reporting new scientific results and addressing technological issues relevant to CVD materials and processes. Thirty four papers have been processed separately for inclusion on the data base

Development of a new process for deposition of metallic vapours and ions

International Nuclear Information System (INIS)

Gabrielli, O. de.

1989-01-01

Surface treatment processes by deposition, enabling surface properties to be altered without altering the volume, are making rapid progress in industry. The description of these processes has led us to consider the role and the importance of methods using plasmas. The new plasma source we have developed is the subject of this experimental research: it is the basis of the deposition process (metallic ion and vapour deposition). The specifications and preliminary results enable us to compare this process with others in use. Fast deposition rates and excellent adhesion are the two main characteristics of this process [fr

Metallization on FDM Parts Using the Chemical Deposition Technique

Directory of Open Access Journals (Sweden)

Azhar Equbal

2014-08-01

Full Text Available Metallization of ABS (acrylonitrile-butadiene-styrene parts has been studied on flat part surfaces. These parts are fabricated on an FDM (fused deposition modeling machine using the layer-wise deposition principle using ABS as a part material. Electroless copper deposition on ABS parts was performed using two different surface preparation processes, namely ABS parts prepared using chromic acid for etching and ABS parts prepared using a solution mixture of sulphuric acid and hydrogen peroxide (H2SO4/H2O2 for etching. After surface preparations using these routes, copper (Cu is deposited electrolessly using four different acidic baths. The acidic baths used are 5 wt% CuSO4 (copper sulfate with 15 wt% of individual acids, namely HF (hydrofluoric acid, H2SO4 (sulphuric acid, H3PO4 (phosphoric acid and CH3COOH (acetic acid. Cu deposition under different acidic baths used for both the routes is presented and compared based on their electrical performance, scanning electron microscopy (SEM and energy dispersive X-ray spectrometry (EDS. The result shows that chromic acid etched samples show better electrical performance and Cu deposition in comparison to samples etched via H2SO4/H2O2.

A synthesis of mineralization styles and geodynamic settings of the Paleozoic and Mesozoic metallic ore deposits in the Altay Mountains, NW China

Science.gov (United States)

Yang, Fuquan; Geng, Xinxia; Wang, Rui; Zhang, Zhixin; Guo, Xuji

2018-06-01

The Altay Mountains within the Xinjiang region of northwestern China hosts major metallic ore deposits. Here we review the geological characteristics, metallogenic features and tectonic settings of these deposits. The metallic ore deposits in the Altay Mountains occur mainly within four regions: North Altay, Central Altay, South Altay and Erqis. We recognize seven types of metallic ore deposits in the Altay Mountains: VMS, submarine volcanogenic iron, magmatic, skarn, pegmatite, hydrothermal vein (Cu-Zn, Fe) and orogenic gold. Among these types, the VMS, pegmatite, orogenic gold and skarn deposits are the most common. Most of the rare metal pegmatite deposits are distributed in Central Altay, with only a few in South Altay. The VMS, submarine volcanogenic type iron and skarn-type deposits are distributed in South Altay, whereas the orogenic-type gold deposits are distributed in the Erqis Fault belt. The hydrothermal vein-type deposits occur in the Erqis Fault belt and Chonghu'er Basin in South Altay. Magmatic-type deposits are mostly in the Erqis Fault belt and Central Altay. Based on isotopic age data, the VMS, submarine volcanogenic-type Fe and skarn-type Cu, Pb, Zn, Fe mineralization occurred during Early-Middle Devonian (∼410-377 Ma), orogenic-type Au, magmatic-type Cu-Ni, and a small number of skarn-type Fe, hydrothermal vein-type Cu-Zn, pegmatite-type rare-metal deposits in Early-Middle Permian (293-261 Ma), pegmatite-type rare-metal deposits, few skarn-type Fe deposit in Early-Middle Triassic (248-232 Ma), and dominantly represented by pegmatite-type rare-metal deposits in Late Triassic-Early Jurassic (223-180 Ma). The metallic ore deposits in the Altay Mountains formed in various tectonic settings, such as the Early-Middle Devonian continental arc and oceanic island arc, Early-Middle Permian post-collisional extensional setting, and Triassic-Early Jurassic intracontinental setting.

Three-Dimensional (3D Printing of Polymer-Metal Hybrid Materials by Fused Deposition Modeling

Directory of Open Access Journals (Sweden)

Susanna Fafenrot

2017-10-01

Full Text Available Fused deposition modeling (FDM is a three-dimensional (3D printing technology that is usually performed with polymers that are molten in a printer nozzle and placed line by line on the printing bed or the previous layer, respectively. Nowadays, hybrid materials combining polymers with functional materials are also commercially available. Especially combinations of polymers with metal particles result in printed objects with interesting optical and mechanical properties. The mechanical properties of objects printed with two of these metal-polymer blends were compared to common poly (lactide acid (PLA printed objects. Tensile tests and bending tests show that hybrid materials mostly containing bronze have significantly reduced mechanical properties. Tensile strengths of the 3D-printed objects were unexpectedly nearly identical with those of the original filaments, indicating sufficient quality of the printing process. Our investigations show that while FDM printing allows for producing objects with mechanical properties similar to the original materials, metal-polymer blends cannot be used for the rapid manufacturing of objects necessitating mechanical strength.

Effect of inclusions on microstructure and toughness of deposited metals of self-shielded flux cored wires

International Nuclear Information System (INIS)

Zhang, Tianli; Li, Zhuoxin; Kou, Sindo; Jing, Hongyang; Li, Guodong; Li, Hong; Jin Kim, Hee

2015-01-01

The effect of inclusions on the microstructure and toughness of the deposited metals of self-shielded flux cored wires was investigated by optical microscopy, electron microscopy and mechanical testing. The deposited metals of three different wires showed different levels of low temperature impact toughness at −40 °C mainly because of differences in the properties of inclusions. The inclusions formed in the deposited metals as a result of deoxidation caused by the addition of extra Al–Mg alloy and ferromanganese to the flux. The inclusions, spherical in shape, were mixtures of Al 2 O 3 and MgO. Inclusions predominantly Al 2 O 3 and 0.3–0.8 μm in diameter were effective for nucleation of acicular ferrite. However, inclusions predominantly MgO were promoted by increasing Mg in the flux and were more effective than Al 2 O 3 inclusions of the same size. These findings suggest that the control of inclusions can be an effective way to improve the impact toughness of the deposited metal

Annealing effect of thermal spike in MgO thin film prepared by cathodic vacuum arc deposition

Energy Technology Data Exchange (ETDEWEB)

Zhu, Daoyun, E-mail: zhudy@gdut.edu.cn [Experiment Teaching Department, Guangdong University of Technology, Guangzhou 510006 (China); State Key Laboratory of Optoelectronic Materials and Technologies, School of Physics and Engineering, Sun Yat-sen University, Guangzhou 510275 (China); Zhao, Shoubai [School of Physics and Electronic Engineering, Guangzhou University, Guangzhou 510400 (China); Zheng, Changxi; Chen, Dihu [State Key Laboratory of Optoelectronic Materials and Technologies, School of Physics and Engineering, Sun Yat-sen University, Guangzhou 510275 (China); He, Zhenhui, E-mail: stshzh@mail.sysu.edu.cn [State Key Laboratory of Optoelectronic Materials and Technologies, School of Physics and Engineering, Sun Yat-sen University, Guangzhou 510275 (China)

2013-12-16

MgO films were prepared by using pulsed cathodic vacuum arc deposition technique. The substrate bias voltage was in the range of −150 to −750 V. Film structure was investigated by X-ray diffraction (XRD). The annealing effect of thermal spike produced by the impacting of energetic ions was analyzed. The calculated results showed that the lifetime of a thermal spike generated by an energetic ion with the energy of 150 eV was less than one picosecond and it was sufficient to allow Mg{sup 2+} or O{sup 2-} to move one bond length to satisfy the intrinsic stress relief in the affected volume. The MgO(200) lattice spacings of the films deposited at different bias voltages were all larger than the ideal value of 2.1056 Å. As the bias amplitude increased the lattice spacing decreased, which indicated that the compressive stress in the film was partially relieved with increasing impacting ion energy. The stress relief also could be reflected from the film orientation with bias voltage. The biaxial elastic modulus for MgO(100), MgO(110) and MgO(111) planes were calculated and they were M{sub (100)} = 199 GPa, M{sub (110)} = 335 GPa and M{sub (111)} = 340 GPa, respectively. The M values indicated that the preferred orientation will be MgO(200) due to the minimum energy configuration when the lattice strain was large. It was confirmed by the XRD results in our experiments. - Highlights: • MgO thin films with preferred orientation were obtained by CVAD technique. • Annealing effect of a thermal spike in MgO film was discussed. • Lattice spacing of MgO film decreased with the increase of bias voltage. • Film preferred orientation changed from (200) to (220) as the bias voltage increased.

Technical specification for vacuum systems

International Nuclear Information System (INIS)

Khaw, J.

1987-01-01

The vacuum systems at the Stanford Linear Accelerator Center (SLAC) are primarily of all-metal construction and operate at pressures from 10 -5 to 10 -11 Torr. The primary gas loads during operation result from thermal desorption and beam-induced desorption from the vacuum chamber walls. These desorption rates can be extremely high in the case of hydrocarbons and other contaminants. These specifications place a major emphasis on eliminating contamination sources. The specifications and procedures have been written to insure the cleanliness and vacuum integrity of all SLAC vacuum systems, and to assist personnel involved with SLAC vacuum systems in choosing and designing components that are compatible with existing systems and meet the quality and reliability of SLAC vacuum standards. The specification includes requirements on design, procurement, fabrication, chemical cleaning, clean room practices, welding and brazing, helium leak testing, residual gas analyzer testing, bakeout, venting, and pumpdown. Also appended are specifications regarding acceptable vendors, isopropyl alcohol, bakeable valve cleaning procedure, mechanical engineering safety inspection, notes on synchrotron radiation, and specifications of numerous individual components

Mechanism of deposit formation on fuel-wetted metal surfaces

Energy Technology Data Exchange (ETDEWEB)

Stavinoha, L.L.; Westbrook, S.R.; McInnis, L.A. [Southwest Research Institute, San Antonio, TX (United States)

1995-05-01

Experiments were performed in a Single-Tube Heat Exchanger (STHE) apparatus and a Hot Liquid Process Simulator (HLPS) configured and operated to meet Jet Fuel Thermal Oxidation Tester (JFTOT) ASTM D 3241 requirements. The HLPS-JFTOT heater tubes used were 1018 mild steel, 316 stainless steel (SS), 304 stainless steel (SS), and 304 SS tubes coated with aluminum, magnesium, gold, and copper. A low-sulfur Jet A fuel with a breakpoint temperature of 254{degrees}C was used to create deposits on the heater tubes at temperatures of 300{degrees}C, 340{degrees}C, and 380{degrees}C. Deposit thickness was measured by dielectric breakdown voltage and Auger ion milling. Pronounced differences between the deposit thickness measuring techniques suggested that both the Auger milling rate and the dielectric strength of the deposit may be affected by deposit morphology/composition (such as metal ions that may have become included in the bulk of the deposit). Carbon burnoff data were obtained as a means of judging the validity of DMD-derived deposit evaluations. ESCA data suggest that the thinnest deposit was on the magnesium-coated test tube. The Scanning Electron Microscope (SEM) photographs showed marked variations in the deposit morphology and the results suggested that surface composition has a significant effect on the mechanism of deposition. The most dramatic effect observed was that the bulk of deposits moved to tube locations of lower temperature as the maximum temperature of the tube was increased from 300{degrees} to 380{degrees}C, also verified in a single-tube heat exchanger. The results indicate that the deposition rate and quantity at elevated temperatures is not completely temperature dependent, but is limited by the concentration of dissolved oxygen and/or reactive components in the fuel over a temperature range.

Influence of Cooling Rate in High-Temperature Area on Hardening of Deposited High-Cutting Chrome-Tungsten Metal

OpenAIRE

Malushin, N. N.; Valuev, Denis Viktorovich; Valueva, Anna Vladimirovna; Serikbol, A.; Borovikov, I. F.

2015-01-01

The authors study the influence of cooling rate in high-temperature area for thermal cycle of high-cutting chrome-tungsten metal weld deposit on the processes of carbide phase merging and austenite grain growth for the purpose of providing high hardness of deposited metal (HRC 64-66).

The spatial thickness distribution of metal films produced by large area pulsed laser deposition

DEFF Research Database (Denmark)

Pryds, Nini; Schou, Jørgen; Linderoth, Søren

2007-01-01

Thin films of metals have been deposited in the large-area Pulsed Laser Deposition (PLD) Facility at Riso National Laboratory. Thin films of Ag and Ni were deposited with laser pulses from an excimer laser at 248 nm with a rectangular beam spot at a fluence of 10 J/cm(2) on glass substrates of 127...

Vacuum arc plasma deposition of thin titanium dioxide films on silicone elastomer as a functional coating for medical applications.

Science.gov (United States)

Boudot, Cécile; Kühn, Marvin; Kühn-Kauffeldt, Marina; Schein, Jochen

2017-05-01

Silicone elastomer is a promising material for medical applications and is widely used for implants with blood and tissue contact. However, its strong hydrophobicity limits adhesion of tissue cells to silicone surfaces, which can impair the healing process. To improve the biological properties of silicone, a triggerless pulsed vacuum cathodic arc plasma deposition technique was applied to deposit titanium dioxide (TiO 2 ) films onto the surface. Scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy, Raman spectroscopy and contact angle measurements were used for coating characterization. Deposited films were about 150nm thick and exhibited good adhesion to the underlying silicone substrate. Surface wettability and roughness both increased after deposition of the TiO 2 layer. In addition, cell-biological investigations demonstrated that the in-vitro cytocompatibility of TiO 2 -coated samples was greatly improved without impacting silicone's nontoxicity. For validation of use in medical devices, further investigations were conducted and demonstrated stability of surface properties in an aqueous environment for a period of 68days and the coating's resistance to several sterilization methods. Copyright © 2016 Elsevier B.V. All rights reserved.

dc breakdown conditioning and breakdown rate of metals and metallic alloys under ultrahigh vacuum

CERN Document Server

Descoeudres, A; Calatroni, S; Taborelli, M; Wuensch, W

2009-01-01

RF accelerating structures of the Compact Linear Collider (CLIC) require a material capable of sustaining high electric field with a low breakdown rate and low induced damage. Because of the similarity of many aspects of DC and RF breakdown, a DC breakdown study is underway at CERN in order to test candidate materials and surface preparations, and have a better understanding of the breakdown mechanism under ultra-high vacuum in a simple setup. Conditioning speeds and breakdown fields of several metals and alloys have been measured. The average breakdown field after conditioning ranges from 100 MV/m for Al to 850 MV/m for stainless steel, and is around 170 MV/m for Cu which is the present base-line material for CLIC structures. The results indicate clearly that the breakdown field is limited by the cathode. The presence of a thin cuprous oxide film at the surface of copper electrodes significantly increases the breakdown field. On the other hand, the conditioning speed of Mo is improved by removing oxides at t...

Atmospheric deposition of heavy metals due to dry, wet and occult deposition at the altitude profile Achenkirch

International Nuclear Information System (INIS)

Stopper, S.

2001-12-01

The goal of this work was to determine the height dependence of the three types of deposition throughout a one year time period to be able to get information about their elevational and seasonal behavior. In the time period from October 1998 to November 1999 measurements of Cd, Co, Cr, Cu, Fe, Mn, Ni, Pb, V and Zn in aerosol, rain and cloud water were conducted in the Achenkirch-Valley in Tyrol, Austria. Afterwards the dry and occult deposition were modeled. The estimated annual inputs of metals at the two measurement sites Christlumkopf (1758 m a.s.l.) Mueeggerkoel (940 m a.s.l.) and the limits of the national law for protection of forest are shown. The measured depositions at both sites were far below the legal regulations. Due to the much higher occult deposition ratio at the top of the mountain the total annual input at the Christlumkopf was higher than at the Mueeggerkoel. This indicates the potential importance of occult deposition. (author)

Optical emission spectra of a copper plasma produced by a metal vapour vacuum arc plasma source

International Nuclear Information System (INIS)

Yotsombat, B.; Poolcharuansin, P.; Vilaithong, T.; Davydov, S.; Brown, I.G.

2001-01-01

Optical emission spectroscopy in the range 200-800 nm was applied for investigation of the copper plasma produced by a metal vapour vacuum arc plasma source. The experiments were conducted for the cases when the plasma was guided by straight and Ω-shaped curved solenoids as well as without solenoids, and also for different vacuum conditions. It was found that, besides singly- and doubly-charged ions, a relatively high concentration of excited neutral copper atoms was present in the plasma. The relative fraction of excited atoms was much higher in the region close to the cathode surface than in the plasma column inside the solenoid. The concentration of excited neutral, singly- and doubly-ionized atoms increased proportionally when the arc current was increased to 400 A. Some weak lines were attributed to more highly ionized copper species and impurities in the cathode material. (author)

Effect of carbon and manganese on the microstructure and mechanical properties of 9Cr2WVTa deposited metals

Energy Technology Data Exchange (ETDEWEB)

Wang, Jian [Key Laboratory of Nuclear Materials and Safety Assessment, Institute of Metal Research, Chinese Academy of Sciences, 110016, Shenyang (China); Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 110016, Shenyang (China); Rong, Lijian [Key Laboratory of Nuclear Materials and Safety Assessment, Institute of Metal Research, Chinese Academy of Sciences, 110016, Shenyang (China); Li, Dianzhong [Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 110016, Shenyang (China); Lu, Shanping, E-mail: shplu@imr.ac.cn [Key Laboratory of Nuclear Materials and Safety Assessment, Institute of Metal Research, Chinese Academy of Sciences, 110016, Shenyang (China); Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 110016, Shenyang (China)

2017-03-15

Six 9Cr2WVTa deposited metals with different carbon and manganese contents have been studied to reveal the role of major elements, which guide for the design of welding consumables for reduced activation ferritic/martensitic steel and meet for the requirements of accelerator driven systems-lead fusion reactors. The typical microstructure for the 9Cr2WVTa deposited metals is the lath martensite along with the fine stripe δ-ferrite. The chemical compositions influence the solidification sequence and therefore, change the δ-ferrite content in the deposited metal. The impact toughness for the 9Cr2WVTa deposited metals decreases remarkably when the δ-ferrite content is more than 5.2 vol%, also the impact toughness decreases owing to the high quenching martensite formation. Increasing the level of manganese addition, α phase of each alloy shifts to the bottom right according to the CCT diagram. - Highlights: • The typical deposited metals is the lath martensite with the fine stripe δ-ferrite. • The impact toughness is dependent on the δ-ferrite and the high quenching martensite. • The chemical compositions influence the solidification sequence.

A measurement of summertime dry deposition of ambient air particulates and associated metallic pollutants in Central Taiwan.

Science.gov (United States)

Fang, Guor-Cheng; Chiang, Hung-Che; Chen, Yu-Cheng; Xiao, You-Fu; Wu, Chia-Ming; Kuo, Yu-Chen

2015-04-01

The purpose of this study is to characterize metallic elements associated with atmospheric particulate matter in the dry deposition plate, total suspended particulate, fine particles, and coarse particles at Taichung Harbor and Gong Ming Junior High School (airport) in central Taiwan at a sampling site from June 2013 to August 2013. The results indicated that: (1) the average concentrations of the metallic elements Cr and Cd were highest at the Gong Ming Junior High School (airport), and the average concentrations of the metallic elements Ni, Cu, and Pb were highest at the Taichung Harbor sampling site. (2) The high smelting industry density and export/import rate of heavily loaded cargos were the main reasons leading to these findings. (3) The average metallic element dry deposition and metallic element PM(2.5-10) all followed the order of Pb > Cr > Cu > Ni > Cd at the two sampling sites. However, the average metallic elements Cu and Pb were found to have the highest dry deposition velocities and concentrations in PM(2.5) for the two sampling sites in this study. (4) The correlation coefficients of ambient air particle dry deposition and concentration with wind speed at the airport were higher than those from the harbor sampling site. The wind and broad open spaces at Taichung Airport were the possible reasons for the increasing correlation coefficients for ambient air particle concentration and dry deposition with wind speed at the Taichung Airport sampling site.

TXRF study of electrochemical deposition of metals on glass-ceramic carbon electrode surfaces

International Nuclear Information System (INIS)

Alov, N.; Oskolok, K.; Wittershagen, A.; Mertens, M.; Rittmeyer, C.; Kolbesen, B.O.

2000-01-01

Nowadays the methods of solid surface analysis are widely used to study the thermodynamic and kinetic aspects of joint electrochemical deposition of metals on solid substrates. In this work the surfaces of some binary and ternary metal electrodeposits on disc glass-ceramic carbon electrodes were studied by total-reflection x-ray fluorescence spectroscopy (TXRF). Metal alloys were obtained as a result of electrochemical co-deposition of copper, cadmium and lead from n x 10 -4 M (Cu, Cd, Pb)(NO 3 ) 2 + 0.01 M HNO 3 solutions under mixing. TXRF measurements were performed with an ATOMIKA EXTRA II A spectrometer using Mo K α and W (Brems) primary excitation. The serious advantage of TXRF as a method of near-surface analysis is very high element sensitivity. Apart from main elements (Cu, Cd, Pb) we have detected trace elements (Cl, Ag, Pt, Hg) which are present in working solution and has an effect to the electrodeposit formation. The comparison of TXRF data with information obtained by X-ray photoelectron spectroscopy and electron-probe x-ray microanalysis permits to realize depth profiling electrochemical alloys. In particular it was found that in binary systems Cu-Pb and Cu-Cd the relative lead and cadmium content on the electrodeposit surface is considerably greater than in the bulk. These phenomena are due to the features of metal nucleation and growth mechanisms. High sensitivity of TXRF to surface morphology and the correlation of TXRF and scanning electron microscopy data allow to determine the area of prevailing location of metal in the heterogeneous alloy surface. So we have established that in Cu-Pb and Cu-Cd-Pb systems solid solution of copper and lead is formed: significant part of lead is deposited not only in specific 3D-clusters but also in copper thin film. It was demonstrated that the near-surface TXRF analysis of metal electrodeposits on solid electrodes is highly effective to study the mechanisms of metal nucleation, metal cluster and thin film

Influence of Cooling Rate in High-Temperature Area on Hardening of Deposited High-Cutting Chrome-Tungsten Metal

International Nuclear Information System (INIS)

Malushin, N N; Valuev, D V; Valueva, A V; Serikbol, A; Borovikov, I F

2015-01-01

The authors study the influence of cooling rate in high-temperature area for thermal cycle of high-cutting chrome-tungsten metal weld deposit on the processes of carbide phase merging and austenite grain growth for the purpose of providing high hardness of deposited metal (HRC 64-66). (paper)

PRODUCTION OF CATHODES AND HIGH PURITY TARGETS OF CHEMICALLY ACTIVE METALS BY MEANS OF ELECTRONIC-RAY MELTING

Directory of Open Access Journals (Sweden)

A. V. Alifanov

2007-01-01

Full Text Available The technical process of production and restoration of worn cathodes and targets of chemically active metals (Ti, Zr, V and others with the help of cathode ray in vacuum is developed. Regenerating of worn cathodes, targets is carried out by means of insertion in chill of worn base and successive cathode ray deposition on certain places of required quantity of metal (from 2 till 50mm.

Evolution of gettering technologies for vacuum tubes to getters for MEMS

Energy Technology Data Exchange (ETDEWEB)

Amiotti, M [SAES Getters S.p.A., Viale Italia 77, 20020 Lainate, Milano (Italy)], E-mail: Marco_Amiotti@saes-group.com

2008-05-01

Getter materials are technically proven and industrially accepted practical ways to maintain vacuum inside hermetically sealed tubes or devices to assure high reliability and long lifetime of the operating devices. The most industrially proven vacuum tube is the cathode rays tubes (CRTs), where large surfaces are available for the deposition of an evaporated barium film by a radio frequency inductive heating of a stainless steel container filled with a BaAl{sub 4} powder mixed to Ni powder. The evolution of the CRTs manufacturing technologies required also new types of barium getters able to withstand some thermal process in air without any deterioration of the evaporation characteristics. In other vacuum tubes such as traveling waves tubes, the space available for the evaporation of a barium film and the sorption capacity required to assure the vacuum for the lifetime of the devices did not allow the use of the barium film, prompting the development of sintered non evaporable getter pills that can be activated during the manufacturing process or by flowing current through an embedded resistance. The same sintered non evaporable getter pills could find usage also in evacuated parts to thermally isolate the infrared sensors for different final applications. In high energy physics particle accelerators, the getter technology moved from localized vacuum getter pumps or getter strips to a getter coating over the surface of vacuum chambers in order to guarantee a more uniform pumping speed. With the advent of solid state electronics, new challenges faced the getter technology to assure long life to vacuum or inert gas filled hermetical packages containing microelectronic devices, especially in the telecommunication and military applications. A well known problem of GaAs devices with Pd or Pt metalization is the H{sub 2} poisoning of the metal gate: to prevent this degradation a two layer getter film has been develop to absorb a large quantity of H{sub 2} per unit of

Report of the Synchrotron Radiation Vacuum Workshop

International Nuclear Information System (INIS)

Avery, R.T.

1984-06-01

The Synchrotron Radiation Vacuum Workshop was held to consider two vacuum-related problems that bear on the design of storage rings and beam lines for synchrotron radiation facilities. These problems are gas desorption from the vacuum chamber walls and carbon deposition on optical components. Participants surveyed existing knowledge on these topics and recommended studies that should be performed as soon as possible to provide more definitive experimental data on these topics. This data will permit optimization of the final design of the Advanced Light Source (ALS) and its associated beam lines. It also should prove useful for other synchrotron radiation facilities as well

Azimuthal Current Density Distribution Resulting from a Power Feed Vacuum Gap in Metallic Liner Experiments at 1 MA

Science.gov (United States)

Bott-Suzuki, Simon; Cordaro, S. W.; Caballero Bendixsen, L. S.; Atoyan, L.; Byvank, T.; Potter, W.; Kusse, B. R.; Greenly, J. B.; Hammer, D. A.; Chittenden, J. P.; Jennings, C. A.

2015-11-01

We present a study investigating the initiation of plasma in solid, metallic liners where the liner thickness is large compared to the collisionless skin depth. A vacuum gap is introduced in the power feed and we investigate the effect of this on the azimuthal initiation of plasma in the liner. We present optical emission data from aluminum liners on the 1 MA, 100ns COBRA generator. We use radial and axial gated imaging and streak photography, which show a dependence of onset of emission with the size of a small power-feed vacuum gap. The evolution of ``hot-spots'' generated from breakdown vacuum gap evolves relatively slowly and azimuthal uniformity is not observed on the experimental time-scale. We also show measurements of the B-field both outside and inside the liner, using miniature Bdot probes, which show a dependence on the liner diameter and thickness, and a correlation to the details of the breakdown. These data will be compared to magneto-hydrodynamic simulations to infer how such non-uniformities may affect full liner implosion experiments.

Metal oxide targets produced by the polymer-assisted deposition method

Energy Technology Data Exchange (ETDEWEB)

Garcia, Mitch A., E-mail: mitch@berkeley.ed [Department of Chemistry, Room 446 Latimer Hall, University of California Berkeley, Berkeley, CA 94720-1460 (United States); Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (United States); Ali, Mazhar N.; Chang, Noel N.; Parsons-Moss, T. [Department of Chemistry, Room 446 Latimer Hall, University of California Berkeley, Berkeley, CA 94720-1460 (United States); Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (United States); Ashby, Paul D. [Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (United States); Gates, Jacklyn M. [Department of Chemistry, Room 446 Latimer Hall, University of California Berkeley, Berkeley, CA 94720-1460 (United States); Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (United States); Stavsetra, Liv [Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (United States); Gregorich, Kenneth E.; Nitsche, Heino [Department of Chemistry, Room 446 Latimer Hall, University of California Berkeley, Berkeley, CA 94720-1460 (United States); Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (United States)

2010-02-11

The polymer-assisted deposition (PAD) method was used to create crack-free homogenous metal oxide films for use as targets in nuclear science applications. Metal oxide films of europium, thulium, and hafnium were prepared as models for actinide oxides. Films produced by a single application of PAD were homogenous and uniform and ranged in thickness from 30 to 320 nm. Reapplication of the PAD method (six times) with a 10% by weight hafnium(IV) solution resulted in an equally homogeneous and uniform film with a total thickness of 600 nm.

Metal oxide targets produced by the polymer-assisted deposition method

International Nuclear Information System (INIS)

Garcia, Mitch A.; Ali, Mazhar N.; Chang, Noel N.; Parsons-Moss, T.; Ashby, Paul D.; Gates, Jacklyn M.; Stavsetra, Liv; Gregorich, Kenneth E.; Nitsche, Heino

2010-01-01

The polymer-assisted deposition (PAD) method was used to create crack-free homogenous metal oxide films for use as targets in nuclear science applications. Metal oxide films of europium, thulium, and hafnium were prepared as models for actinide oxides. Films produced by a single application of PAD were homogenous and uniform and ranged in thickness from 30 to 320 nm. Reapplication of the PAD method (six times) with a 10% by weight hafnium(IV) solution resulted in an equally homogeneous and uniform film with a total thickness of 600 nm.

The Corrosion Protection of Metals by Ion Vapor Deposited Aluminum

Science.gov (United States)

Danford, M. D.

1993-01-01

A study of the corrosion protection of substrate metals by ion vapor deposited aluminum (IVD Al) coats has been carried out. Corrosion protection by both anodized and unanodized IVD Al coats has been investigated. Base metals included in the study were 2219-T87 Al, 7075-T6 Al, Titanium-6 Al-4 Vanadium (Ti-6Al-4V), 4130 steel, D6AC steel, and 4340 steel. Results reveal that the anodized IVD Al coats provide excellent corrosion protection, but good protection is also achieved by IVD Al coats that have not been anodized.

Preparation of carbon-free TEM microgrids by metal sputtering

International Nuclear Information System (INIS)

Janbroers, S.; Kruijff, T.R. de; Xu, Q.; Kooyman, P.J.; Zandbergen, H.W.

2009-01-01

A new method for preparing carbon-free, temperature-stable Transmission Electron Microscope (TEM) grids is presented. An 80% Au/20% Pd metal film is deposited onto a 'holey' microgrid carbon supported on standard mixed-mesh Au TEM grids. Subsequently, the carbon film is selectively removed using plasma cleaning. In this way, an all-metal TEM film is made containing the 'same' microgrid as the original carbon film. Although electron transparency of the foil is reduced significantly, the open areas for TEM inspection of material over these areas are maintained. The metal foil can be prepared with various thicknesses and ensures good electrical conductivity. The new Au/Pd grids are stable to at least 775 K under vacuum conditions.

Preparation of carbon-free TEM microgrids by metal sputtering.

Science.gov (United States)

Janbroers, S; de Kruijff, T R; Xu, Q; Kooyman, P J; Zandbergen, H W

2009-08-01

A new method for preparing carbon-free, temperature-stable Transmission Electron Microscope (TEM) grids is presented. An 80% Au/20% Pd metal film is deposited onto a 'holey' microgrid carbon supported on standard mixed-mesh Au TEM grids. Subsequently, the carbon film is selectively removed using plasma cleaning. In this way, an all-metal TEM film is made containing the 'same' microgrid as the original carbon film. Although electron transparency of the foil is reduced significantly, the open areas for TEM inspection of material over these areas are maintained. The metal foil can be prepared with various thicknesses and ensures good electrical conductivity. The new Au/Pd grids are stable to at least 775K under vacuum conditions.

Solid lubricant mass contact transfer technology usage for vacuum ball bearings longevity increasing

Science.gov (United States)

Arzymatov, B.; Deulin, E.

2016-07-01

A contact mass transfer technological method of solid lubricant deposition on components of vacuum ball bearings is presented. Physics-mathematical model of process contact mass transfer is being considered. The experimental results of ball bearings covered with solid lubricant longevity in vacuum are presented. It is shown that solid lubricant of contact mass transfer method deposition is prospective for ball bearing longevity increasing.

Effect of carbon and manganese on the microstructure and mechanical properties of 9Cr2WVTa deposited metals

Science.gov (United States)

Wang, Jian; Rong, Lijian; Li, Dianzhong; Lu, Shanping

2017-03-01

Six 9Cr2WVTa deposited metals with different carbon and manganese contents have been studied to reveal the role of major elements, which guide for the design of welding consumables for reduced activation ferritic/martensitic steel and meet for the requirements of accelerator driven systems-lead fusion reactors. The typical microstructure for the 9Cr2WVTa deposited metals is the lath martensite along with the fine stripe δ-ferrite. The chemical compositions influence the solidification sequence and therefore, change the δ-ferrite content in the deposited metal. The impact toughness for the 9Cr2WVTa deposited metals decreases remarkably when the δ-ferrite content is more than 5.2 vol%, also the impact toughness decreases owing to the high quenching martensite formation. Increasing the level of manganese addition, α phase of each alloy shifts to the bottom right according to the CCT diagram.

Trend of heavy metal and sulphur deposition in Finland from the 1980`s to 1990`s

Energy Technology Data Exchange (ETDEWEB)

Kubin, E.; Lippo, H. [Forest Research Inst., Muhos (Finland)

1995-12-31

The moss technique to survey atmospheric heavy metal deposition was developed in Sweden in the late 1960`s. The surveys has extended from regional and national basis to cover all the Nordic countries in 1985, to northern Europe in 1990 and to a large part of Europe in 1990-92. National reports have also been published in many countries. The Forest Research Institute established a network of 3009 secret permanent monitoring sites all over the country in 1985 and 1986 for forest inventory and for monitoring the situation and changes in the forests. One essential part has been to study the effects of air pollution - including heavy metal and sulphur deposition on forests. Deposition has been monitored by collecting bioindicators and analysing the element concentrations. The purpose of this report is to show the trend of the heavy metal and sulphur deposition from the 1980`s to 1990`s and in addition to produce information about the emission sources. (author)

Trend of heavy metal and sulphur deposition in Finland from the 1980`s to 1990`s

Energy Technology Data Exchange (ETDEWEB)

Kubin, E; Lippo, H [Forest Research Inst., Muhos (Finland)

1996-12-31

The moss technique to survey atmospheric heavy metal deposition was developed in Sweden in the late 1960`s. The surveys has extended from regional and national basis to cover all the Nordic countries in 1985, to northern Europe in 1990 and to a large part of Europe in 1990-92. National reports have also been published in many countries. The Forest Research Institute established a network of 3009 secret permanent monitoring sites all over the country in 1985 and 1986 for forest inventory and for monitoring the situation and changes in the forests. One essential part has been to study the effects of air pollution - including heavy metal and sulphur deposition on forests. Deposition has been monitored by collecting bioindicators and analysing the element concentrations. The purpose of this report is to show the trend of the heavy metal and sulphur deposition from the 1980`s to 1990`s and in addition to produce information about the emission sources. (author)

Vacuum fused deposition modelling system to improve tensile ...

African Journals Online (AJOL)

In the printing process, the interlayer bonding is made too quick thus the layers are not fully fused together causing the reduced tensile strength. This paper presents a possible solution to this problem by incorporating vacuum technology in FDM system to improve tensile strength of 3D printed specimens. In this study, a ...

Effect of thermal annealing in vacuum on the photovoltaic properties of electrodeposited Cu2O-absorber solar cell

Directory of Open Access Journals (Sweden)

Dimopoulos T.

2014-07-01

Full Text Available Heterojunction solar cells were fabricated by electrochemical deposition of p-type, cuprous oxide (Cu2O absorber on sputtered, n-type ZnO layer. X-ray diffraction measurements revealed that the as-deposited absorber consists mainly of Cu2O, but appreciable amounts of metallic Cu and cupric oxide (CuO are also present. These undesired oxidation states are incorporated during the deposition process and have a detrimental effect on the photovoltaic properties of the cells. The open circuit voltage (VOC, short circuit current density (jSC, fill factor (FF and power conversion efficiency (η of the as-deposited cells are 0.37 V, 3.71 mA/cm2, 35.7% and 0.49%, respectively, under AM1.5G illumination. We show that by thermal annealing in vacuum, at temperatures up to 300 °C, compositional purity of the Cu2O absorber could be obtained. A general improvement of the heterojunction and bulk materials quality is observed, reflected upon the smallest influence of the shunt and series resistance on the transport properties of the cells in dark and under illumination. Independent of the annealing temperature, transport is dominated by the space-charge layer generation-recombination current. After annealing at 300 °C the solar cell parameters could be significantly improved to the values of: VOC = 0.505 V, jSC = 4.67 mA/cm2, FF = 47.1% and η = 1.12%.

Polymer-assisted metal deposition (PAMD): a full-solution strategy for flexible, stretchable, compressible, and wearable metal conductors.

Science.gov (United States)

Yu, You; Yan, Casey; Zheng, Zijian

2014-08-20

Metal interconnects, contacts, and electrodes are indispensable elements for most applications of flexible, stretchable, and wearable electronics. Current fabrication methods for these metal conductors are mainly based on conventional microfabrication procedures that have been migrated from Si semiconductor industries, which face significant challenges for organic-based compliant substrates. This Research News highlights a recently developed full-solution processing strategy, polymer-assisted metal deposition (PAMD), which is particularly suitable for the roll-to-roll, low-cost fabrication of high-performance compliant metal conductors (Cu, Ni, Ag, and Au) on a wide variety of organic substrates including plastics, elastomers, papers, and textiles. This paper presents i) the principles of PAMD, and how to use it for making ii) flexible, stretchable, and wearable conductive metal electrodes, iii) patterned metal interconnects, and d) 3D stretchable and compressible metal sponges. A critical perspective on this emerging strategy is also provided. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Improving the conductance of ZnO thin film doping with Ti by using a cathodic vacuum arc deposition process

International Nuclear Information System (INIS)

Wu, Chun-Sen; Lin, Bor-Tsuen; Jean, Ming-Der

2011-01-01

The Ti-doped ZnO films compared to un-doped ZnO films were deposited onto Corning XG glass substrates by using a cathodic vacuum arc deposition process in a mixture of oxygen and argon gases. The structural, electrical and optical properties of un-doped and Ti-doped ZnO films have been investigated. When the Ti target power is about 750 W, the incorporation of titanium atoms into zinc oxide films is obviously effective. Additionally, the resistivity of un-doped ZnO films is high and reduces to a value of 3.48 x 10 -3 Ω-cm when Ti is incorporated. The Ti doped in the ZnO films gave rise to the improvement of the conductivity of the films obviously. The Ti-doped ZnO films have > 85% transmittance in a range of 400-700 nm.

Portable ultrahigh-vacuum sample storage system for polarization-dependent total-reflection fluorescence x-ray absorption fine structure spectroscopy

Energy Technology Data Exchange (ETDEWEB)

Watanabe, Yoshihide, E-mail: e0827@mosk.tytlabs.co.jp; Nishimura, Yusaku F.; Suzuki, Ryo; Beniya, Atsushi; Isomura, Noritake [Toyota Central R& D Labs., Inc., Yokomichi 41-1, Nagakute, Aichi 480-1192 (Japan); Uehara, Hiromitsu; Asakura, Kiyotaka; Takakusagi, Satoru [Catalysis Research Center, Hokkaido University, Kita 21-10, Sapporo, Hokkaido 001-0021 (Japan); Nimura, Tomoyuki [AVC Co., Ltd., Inada 1450-6, Hitachinaka, Ibaraki 312-0061 (Japan)

2016-03-15

A portable ultrahigh-vacuum sample storage system was designed and built to investigate the detailed geometric structures of mass-selected metal clusters on oxide substrates by polarization-dependent total-reflection fluorescence x-ray absorption fine structure spectroscopy (PTRF-XAFS). This ultrahigh-vacuum (UHV) sample storage system provides the handover of samples between two different sample manipulating systems. The sample storage system is adaptable for public transportation, facilitating experiments using air-sensitive samples in synchrotron radiation or other quantum beam facilities. The samples were transferred by the developed portable UHV transfer system via a public transportation at a distance over 400 km. The performance of the transfer system was demonstrated by a successful PTRF-XAFS study of Pt{sub 4} clusters deposited on a TiO{sub 2}(110) surface.

Some aspects of vacuum ultraviolet radiation physics

CERN Document Server

Damany, Nicole; Vodar, Boris

2013-01-01

Some Aspects of Vacuum Ultraviolet Radiation Physics presents some data on the state of research in vacuum ultraviolet radiation in association with areas of physics. Organized into four parts, this book begins by elucidating the optical properties of solids in the vacuum ultraviolet region (v.u.v.), particularly the specific methods of determination of optical constants in v.u.v., the properties of metals, and those of ionic insulators. Part II deals with molecular spectroscopy, with emphasis on the spectra of diatomic and simple polyatomic molecules, paraffins, and condensed phases. Part III

Vacuum-plasma-sprayed silicon coatings

International Nuclear Information System (INIS)

Varacalle, D.J. Jr.; Herman, H.; Bancke, G.A.; Burchell, T.D.; Romanoski, G.R.

1991-01-01

Vacuum plasma spraying produces well-bonded dense stress-free coatings for a variety of materials on a wide range of substrates. The process is used in many industries for the excellent wear, corrosion resistance and high temperature behavior of the fabricated coatings. In this study, silicon metal was deposited on graphite to study the feasibility of preventing corrosion and oxidation of graphite components for nuclear reactors. Operating parameters were varied in a Taguchi design of experiments to display the range of the plasma processing conditions and their effect on the measured coating characteristics. The coating attributes evaluated were thickness, porosity, microhardness and phase content. This paper discusses the influence of the processing parameters on as-sprayed coating qualities. The paper also discusses the effect of thermal cycling on silicon samples in an inert helium atmosphere. The diffraction spectrum for a sample that experienced a 1600degC temperature cycle indicated that more than 99% of the coating transformed to β-SiC. The silicon coatings protected the graphite substrates from oxidation in one experiment. (orig.)

First mirror deposition/erosion experiment by using multi-purpose manipulators in KSTAR

Energy Technology Data Exchange (ETDEWEB)

Hong, Suk-Ho, E-mail: sukhhong@nfri.re.kr [National Fusion Research Institute, Daejeon (Korea, Republic of); University of Science and Technology, Daejeon (Korea, Republic of); Department of Electrical Engineering, Hanyang University, Seoul (Korea, Republic of); Bang, Eunnam; Son, Soohyun [National Fusion Research Institute, Daejeon (Korea, Republic of); Kogut, Dmitry; Douai, David [CEA, IRFM, Association Euratom-CEA, Paul lez Durance (France)

2016-11-01

First mirrors are essential plasma-facing components (PFCs) for fusion devices. Erosion and redeposition on first mirrors are of interest, since they cause degradation of signal intensity. In order to trace deposition/erosion characteristics of amorphous hydrogenated carbon (a-C:H) films on first mirrors, two manipulators attached at midplane and divertor regions of KSTAR vacuum vessel are utilized. A net deposition rate of 0.3–0.5 nm/s during a discharge and an erosion rates of 0.1 nm/s during He ion cyclotron wall conditioning (ICWC) are obtained. Property of redeposited layers are different depending on the location, varying from soft polymer-like to hard diamond-like a-C:H layers. For the deposition and erosion of metal layers, a plan for a dedicated experimental session has been set at KSTAR.

First mirror deposition/erosion experiment by using multi-purpose manipulators in KSTAR

International Nuclear Information System (INIS)

Hong, Suk-Ho; Bang, Eunnam; Son, Soohyun; Kogut, Dmitry; Douai, David

2016-01-01

First mirrors are essential plasma-facing components (PFCs) for fusion devices. Erosion and redeposition on first mirrors are of interest, since they cause degradation of signal intensity. In order to trace deposition/erosion characteristics of amorphous hydrogenated carbon (a-C:H) films on first mirrors, two manipulators attached at midplane and divertor regions of KSTAR vacuum vessel are utilized. A net deposition rate of 0.3–0.5 nm/s during a discharge and an erosion rates of 0.1 nm/s during He ion cyclotron wall conditioning (ICWC) are obtained. Property of redeposited layers are different depending on the location, varying from soft polymer-like to hard diamond-like a-C:H layers. For the deposition and erosion of metal layers, a plan for a dedicated experimental session has been set at KSTAR.

Influence of pulsed substrate bias on the structure and properties of Ti-Al-N films deposited by cathodic vacuum arc

Energy Technology Data Exchange (ETDEWEB)

Zhang, G.P., E-mail: princeterry@163.com [Institute of Physics, Chinese Academy of Science, Beijing 100080 (China); Gao, G.J. [Changchun University of Science and Technology, College of Science, Changchun 130000 (China); Wang, X.Q.; Lv, G.H.; Zhou, L.; Chen, H.; Pang, H.; Yang, S.Z. [Institute of Physics, Chinese Academy of Science, Beijing 100080 (China)

2012-07-15

Ti-Al-N films were deposited by cathodic vacuum arc (CVA) technique in N{sub 2} atmosphere with different pulsed substrate bias. The influence of pulsed substrate bias (0 to -800 V) on the deposition rate, surface morphology, crystal structure, and mechanical properties of the Ti-Al-N films were systematically investigated. Increasing pulsed bias voltage resulted in the decrease of deposition rate but the increase of surface roughness. It was found that there was a strong correlation between the pulsed bias and film structure. All the films studied in this paper were composed of TiN, AlN, and Ti-Al-N ternary phases. The grains changed from equiaxial to columnar and exhibited preferred orientation when the pulsed bias increased. With the increase of pulsed bias voltage, the atomic ratio of Ti to Al element increased gradually, while the N to (Ti + Al) ratio decreased. The composite films present an enhanced nanohardness compared with binary TiN and ZrN films. The film deposited with pulsed bias of -200 V possessed the maximum scratch critical load and nanohardness. The minimum friction coefficient with pulsed bias of -300 V was obtained.

Organic/metal interfaces. Electronic and structural properties

Energy Technology Data Exchange (ETDEWEB)

Duhm, Steffen

2008-07-17

This work addresses several important topics of the field of organic electronics. The focus lies on organic/metal interfaces, which exist in all organic electronic devices. Physical properties of such interfaces are crucial for device performance. Four main topics have been covered: (i) the impact of molecular orientation on the energy levels, (ii) energy level tuning with strong electron acceptors, (iii) the role of thermodynamic equilibrium at organic/ organic homo-interfaces and (iv) the correlation of interfacial electronic structure and bonding distance. To address these issues a broad experimental approach was necessary: mainly ultraviolet photoelectron spectroscopy was used, supported by X-ray photoelectron spectroscopy, metastable atom electron spectroscopy, X-ray diffraction and X-ray standing waves, to examine vacuum sublimed thin films of conjugated organic molecules (COMs) in ultrahigh vacuum. (i) A novel approach is presented to explain the phenomenon that the ionization energy in molecular assemblies is orientation dependent. It is demonstrated that this is due to a macroscopic impact of intramolecular dipoles on the ionization energy in molecular assemblies. Furthermore, the correlation of molecular orientation and conformation has been studied in detail for COMs on various substrates. (ii) A new approach was developed to tune hole injection barriers ({delta}{sub h}) at organic/metal interfaces by adsorbing a (sub-) monolayer of an organic electron acceptor on the metal electrode. Charge transfer from the metal to the acceptor leads to a chemisorbed layer, which reduces {delta}{sub h} to the COM overlayer. This concept was tested with three acceptors and a lowering of {delta}{sub h} of up to 1.2 eV could be observed. (iii) A transition from vacuum-level alignment to molecular level pinning at the homo-interface between a lying monolayer and standing multilayers of a COM was observed, which depended on the amount of a pre-deposited acceptor. The

Lifetimes of Multiply Alkylated Cyclopentane Oil in Contact with Various Metals, Evaluated with Vacuum Spiral Orbit Tribometer

Science.gov (United States)

Pepper, Stephen V.

2018-01-01

The dependence of the lifetimes of small quantities of a Multiply Alkylated Cyclopentane (MAC) lubricant oil, Pennzane (Registered Trademark) 2001A (Nye Lubricants, Inc.), in rolling and sliding contact with different metals was evaluated with a vacuum spiral orbit tribometer. The metals were the bearing alloys 52100 steel, 440C steel, 17-4 PH steel and Nitinol 60 and the elements chromium, vanadium and titanium. The lifetimes of the lubricant oil on different metals fell into distinct groups with 52100 greater than 440C approx. Nitinol 60 greater than 17-4 PH for the order of the lifetimes of the steels and chromium greater than vanadium greater than titanium for the order of the lifetimes for the elements. The limited life of the small quantities of oil is assumed to be due to its consumption by the tribochemical reaction of the oil with the different metal bearing materials. The lifetimes are then inversely related to the reaction rates of the oil molecules with the various metals: the longest life of 52100 steel having the lowest reaction rate and the shortest life of titanium having the highest reaction rate. Mechanisms for the tribochemical reactions are discussed.

Heteroepitaxial Growth of Vacuum-Evaporated Si-Ge Films on Nano structured Silicon Substrates

International Nuclear Information System (INIS)

Ayu Wazira Azhari; Ayu Wazira Azhari; Kamaruzzaman Sopian; Saleem Hussain Zaidi

2015-01-01

In this study, a low-cost vacuum-evaporated technique is used in the heteroepitaxial growth of Si-Ge films. Three different surface variations are employed: for example polished Si, Si micro pyramids and Si nano pillars profiles. A simple metal-assisted chemical etching method is used to fabricate the Si nano pillars, with Ag acting as a catalyst. Following deposition, substrates are subjected to post-deposition thermal annealing at 1000 degree Celsius to improve the crystallinity of the Ge layer. Optical and morphological studies of surface area are conducted using field emission scanning electron microscopy (FE-SEM), Energy Dispersive X-ray (EDX), Raman spectroscopy and infrared spectroscopy. From the infrared spectroscopy analysis, the energy bandgap for Si-Ge films is estimated to be around 0.94 eV. This high-quality Si-Ge film is most favourable for optics, optoelectronics and high-efficiency solar cell applications. (author)

Evaluation of target power supplies for krypton storage in sputter-deposited metals

International Nuclear Information System (INIS)

Greenwell, E.N.; McClanahan, E.D.; Moss, R.W.

1986-04-01

Implantation of 85 Kr in a growing sputtered metal deposit has been studied for the containment of 85 Kr recovered from the reprocessing of spent nuclear fuel. PNL, as part of DOE's research program for 85 Kr storage, has developed krypton trapping storage devices (KTSDs) in a range of sizes for ''cold'' and radioactive testing. The KTSD is a stainless steel canister that contains a sputtering target for depositing an amorphous rare-earth transition metal on the inner wall and simultaneously implanting low-energy krypton ions in the growing deposit. This report covers the design requirements for the target power supply and the description, testing and evaluation of three basic designs. The designs chosen for evaluation were: (1) a standard commercial power supply with an external PNL-designed current interrupter, (2) a commercially manufactured power supply with an integral series-type interrupter, and (3) a commercially manufactured power supply with an integral shunt-type interrupter. The units were compared on the basis of performance, reliability, and life-cycle cost. 8 refs., 9 figs., 2 tabs

Determination of toxic metals in salt deposits in Bormanda, Nigeria ...

African Journals Online (AJOL)

lawal

3,12,13,14,15,16 . Chromium and Arsenic were not detected in any salt sample. Generally, the results of this study revealed the occurrence of some toxic metals in association with the soil salt deposits. Therefore, it is important to undertake Hazard Analysis and Critical Control. Point (HACCP) studies to identify and integrate.

A high-performance, flexible and robust metal nanotrough-embedded transparent conducting film for wearable touch screen panels

Science.gov (United States)

Im, Hyeon-Gyun; An, Byeong Wan; Jin, Jungho; Jang, Junho; Park, Young-Geun; Park, Jang-Ung; Bae, Byeong-Soo

2016-02-01

We report a high-performance, flexible and robust metal nanotrough-embedded transparent conducting hybrid film (metal nanotrough-GFRHybrimer). Using an electro-spun polymer nanofiber web as a template and vacuum-deposited gold as a conductor, a junction resistance-free continuous metal nanotrough network is formed. Subsequently, the metal nanotrough is embedded on the surface of a glass-fabric reinforced composite substrate (GFRHybrimer). The monolithic composite structure of our transparent conducting film allows simultaneously high thermal stability (24 h at 250 °C in air), a smooth surface topography (Rrms touch screen panel (TSP) is fabricated using the transparent conducting films. The flexible TSP device stably operates on the back of a human hand and on a wristband.We report a high-performance, flexible and robust metal nanotrough-embedded transparent conducting hybrid film (metal nanotrough-GFRHybrimer). Using an electro-spun polymer nanofiber web as a template and vacuum-deposited gold as a conductor, a junction resistance-free continuous metal nanotrough network is formed. Subsequently, the metal nanotrough is embedded on the surface of a glass-fabric reinforced composite substrate (GFRHybrimer). The monolithic composite structure of our transparent conducting film allows simultaneously high thermal stability (24 h at 250 °C in air), a smooth surface topography (Rrms touch screen panel (TSP) is fabricated using the transparent conducting films. The flexible TSP device stably operates on the back of a human hand and on a wristband. Electronic supplementary information (ESI) available. See DOI: 10.1039/c5nr07657a

Experimental investigation on the energy deposition and morphology of the electrical explosion of copper wire in vacuum

International Nuclear Information System (INIS)

Shi, Zongqian; Shi, Yuanjie; Wang, Kun; Jia, Shenli

2016-01-01

This paper presents the experimental results of the electrical explosion of copper wires in vacuum using negative nanosecond-pulsed current with magnitude of 1–2 kA. The 20 μm-diameter copper wires with different lengths are exploded with three different current rates. A laser probe is applied to construct the shadowgraphy and interferometry diagnostics to investigate the distribution and morphology of the exploding product. The interference phase shift is reconstructed from the interferogram, by which the atomic density distribution is calculated. Experimental results show that there exist two voltage breakdown modes depending on the amount of the specific energy deposition. For the strong-shunting mode, shunting breakdown occurs, leading to the short-circuit-like current waveform. For the weak-shunting mode with less specific energy deposition, the plasma generated during the voltage breakdown is not enough to form a conductive plasma channel, resulting in overdamped declining current waveform. The influence of the wire length and current rate on the characteristics of the exploding wires is also analyzed.

Experimental investigation on the energy deposition and morphology of the electrical explosion of copper wire in vacuum

Energy Technology Data Exchange (ETDEWEB)

Shi, Zongqian; Shi, Yuanjie; Wang, Kun; Jia, Shenli [State Key Laboratory of Electrical Insulation and Power Equipment, Xi' an Jiaotong University, Shanxi 710049 (China)

2016-03-15

This paper presents the experimental results of the electrical explosion of copper wires in vacuum using negative nanosecond-pulsed current with magnitude of 1–2 kA. The 20 μm-diameter copper wires with different lengths are exploded with three different current rates. A laser probe is applied to construct the shadowgraphy and interferometry diagnostics to investigate the distribution and morphology of the exploding product. The interference phase shift is reconstructed from the interferogram, by which the atomic density distribution is calculated. Experimental results show that there exist two voltage breakdown modes depending on the amount of the specific energy deposition. For the strong-shunting mode, shunting breakdown occurs, leading to the short-circuit-like current waveform. For the weak-shunting mode with less specific energy deposition, the plasma generated during the voltage breakdown is not enough to form a conductive plasma channel, resulting in overdamped declining current waveform. The influence of the wire length and current rate on the characteristics of the exploding wires is also analyzed.

Structure and corrosion properties of Cr coating deposited on aerospace bearing steel

Science.gov (United States)

Wang, Fangfang; Zhang, Fengxiang; Zheng, Lijing; Zhang, Hu

2017-11-01

The corrosion protection of chromium coating deposited on aerospace bearing steels by using the Filtered Cathodic Vacuum Arc deposition- Metal Evaporation Vacuum Arc duplex technique (MEVVA-FCVA) had been investigated. The protection efficiency of chromium coating on different substrate materials had also been evaluated. The chromium coating was mainly composed of nanocrystallineα-Cr in a range of 50-200 nm. The orientation distributions of α-Cr film on substrates with different composition had a certain difference to each other. Electrochemical experimental results indicated that the chromium coating significantly improved the corrosion resistance of experimental bearing steels in 3.5% NaCl solution. The protective efficiency of chromium films were all over 98%. The corrosion resistance of chromium coating was influenced by the chemical composition of substrate material. The chromium coatings on higher Cr-containing substrate displayed lower corrosion current density and more positive corrosion potential. The increase of passive film thickness and the formation of a mass of chromium oxide and hydroxide on the surface are responsible for the improved corrosion properties.

Sol-gel deposition of buffer layers on biaxially textured metal substances

Science.gov (United States)

Shoup, Shara S.; Paranthamam, Mariappan; Beach, David B.; Kroeger, Donald M.; Goyal, Amit

2000-01-01

A method is disclosed for forming a biaxially textured buffer layer on a biaxially oriented metal substrate by using a sol-gel coating technique followed by pyrolyzing/annealing in a reducing atmosphere. This method is advantageous for providing substrates for depositing electronically active materials thereon.

High-rate deposition of Ta-doped SnO2 films by reactive magnetron sputtering using a Sn–Ta metal-sintered target

International Nuclear Information System (INIS)

Muto, Y.; Nakatomi, S.; Oka, N.; Iwabuchi, Y.; Kotsubo, H.; Shigesato, Y.

2012-01-01

Ta-doped SnO 2 films were deposited on glass substrate (either unheated or heated at 200 °C) by reactive magnetron sputtering with a Sn–Ta metal-sintered target using a plasma control unit (PCU) and mid-frequency (mf, 50 kHz) unipolar pulsing. The PCU feedback system precisely controlled the flow of the reactive and sputtering gases (O 2 and Ar, respectively) by monitoring either discharge impedance or the plasma emission of the atomic O* line at 777 nm. The planar target was connected to the switching unit, which was operated in unipolar pulse mode. Power density on the target was maintained at 4.4 W cm −2 during deposition. The lowest obtained resistivity for the films deposited on heated substrate was 6.4 × 10 −3 Ωcm, where the deposition rate was 250 nm min −1 .

Internal motion in high vacuum systems

Science.gov (United States)

Frank, J. M.

Three transfer and positioning mechanisms have been developed for the non-air exposed, multistep processing of components in vacuum chambers. The functions to be performed in all of the systems include ultraviolet/ozone cleaning, vacuum baking, deposition of thin films, and thermocompression sealing of the enclosures. Precise positioning of the components is required during the evaporation and sealing processes. The three methods of transporting and positioning the components were developed to accommodate the design criteria and goals of each individual system. The design philosophy, goals, and operation of the three mechanisms are discussed.

Entrapment of krypton in sputter deposited metals: a storage medium for radioactive gases

International Nuclear Information System (INIS)

Tingey, G.L.; McClanahan, E.D.; Bayne, M.A.; Moss, R.W.

1979-04-01

Sputter deposition of metals with a negative substrate bias results in a deposit containing relatively large concentrations of the sputtering gas. This phenomenon has been applied as a technique for storage of the radioactive gas, 85 Kr, which is generated in nuclear fuels for power production. Alloys which sputter to yield an amorphous product have been shown to contain up to 12 atom % Kr [42 cm 3 of Kr(STP)/g of deposit; concentration equivalent to a gas at 4380 psi pressure]. Release from these metals occurs at so low a rate that extrapolation to long times yields a 85 Kr release at 300 0 C of about 0.06% in 100 years. A preliminary evaluation of the engineering feasibility and economics of the sputtering process indicates that 85 Kr can be effectively trapped in a solid matrix with currently available techniques on a scale required for handling DOE-generated waste or commercial reprocessed fuels and that the cost should not be a limiting factor

Fourth-generation plasma immersion ion implantation and deposition facility for hybrid surface modification layer fabrication

International Nuclear Information System (INIS)

Wang Langping; Huang Lei; Xie Zhiwen; Wang Xiaofeng; Tang Baoyin

2008-01-01

The fourth-generation plasma immersion ion implantation and deposition (PIIID) facility for hybrid and batch treatment was built in our laboratory recently. Comparing with our previous PIIID facilities, several novel designs are utilized. Two multicathode pulsed cathodic arc plasma sources are fixed on the chamber wall symmetrically, which can increase the steady working time from 6 h (the single cathode source in our previous facilities) to about 18 h. Meanwhile, the inner diameter of the pulsed cathodic arc plasma source is increased from the previous 80 to 209 mm, thus, large area metal plasma can be obtained by the source. Instead of the simple sample holder in our previous facility, a complex revolution-rotation sample holder composed of 24 shafts, which can rotate around its axis and adjust its position through revolving around the center axis of the vacuum chamber, is fixed in the center of the vacuum chamber. In addition, one magnetron sputtering source is set on the chamber wall instead of the top cover in the previous facility. Because of the above characteristic, the PIIID hybrid process involving ion implantation, vacuum arc, and magnetron sputtering deposition can be acquired without breaking vacuum. In addition, the PIIID batch treatment of cylinderlike components can be finished by installing these components on the rotating shafts on the sample holder

Fourth-generation plasma immersion ion implantation and deposition facility for hybrid surface modification layer fabrication.

Science.gov (United States)

Wang, Langping; Huang, Lei; Xie, Zhiwen; Wang, Xiaofeng; Tang, Baoyin

2008-02-01

The fourth-generation plasma immersion ion implantation and deposition (PIIID) facility for hybrid and batch treatment was built in our laboratory recently. Comparing with our previous PIIID facilities, several novel designs are utilized. Two multicathode pulsed cathodic arc plasma sources are fixed on the chamber wall symmetrically, which can increase the steady working time from 6 h (the single cathode source in our previous facilities) to about 18 h. Meanwhile, the inner diameter of the pulsed cathodic arc plasma source is increased from the previous 80 to 209 mm, thus, large area metal plasma can be obtained by the source. Instead of the simple sample holder in our previous facility, a complex revolution-rotation sample holder composed of 24 shafts, which can rotate around its axis and adjust its position through revolving around the center axis of the vacuum chamber, is fixed in the center of the vacuum chamber. In addition, one magnetron sputtering source is set on the chamber wall instead of the top cover in the previous facility. Because of the above characteristic, the PIIID hybrid process involving ion implantation, vacuum arc, and magnetron sputtering deposition can be acquired without breaking vacuum. In addition, the PIIID batch treatment of cylinderlike components can be finished by installing these components on the rotating shafts on the sample holder.

The deposition of thin metal films at the high-intensity pulsed-ion-beam influence on the metals

International Nuclear Information System (INIS)

Remnev, G.E.; Zakoutaev, A.N.; Grushin, I.I.; Matvenko, V.M.; Potemkin, A.V.; Ryzhkov, V.A.; Chernikov, E.V.

1996-01-01

A high-intensity pulsed ion beam with parameters: ion energy 350-500 keV, ion current density at a target > 200 A/cm 2 , pulse duration 60 ns, was used for metal deposition. The film deposition rate was 0.6-4.0 mm/s. Transmission electron microscopy/transmission electron diffraction investigations of the copper target-film system were performed. The impurity content in the film was determined by x-ray fluorescence analysis and secondary ion mass spectrometry. The angular distributions of the ablated plasma were measured. (author). 2 figs., 7 refs

The deposition of thin metal films at the high-intensity pulsed-ion-beam influence on the metals

Energy Technology Data Exchange (ETDEWEB)

Remnev, G E; Zakoutaev, A N; Grushin, I I; Matvenko, V M; Potemkin, A V; Ryzhkov, V A [Tomsk Polytechnic Univ. (Russian Federation). Nuclear Physics Inst.; Ivanov, Yu F [Construction Academy, Tomsk (Russian Federation); Chernikov, E V [Siberian Physical Technical Institute, Tomsk (Russian Federation)

1997-12-31

A high-intensity pulsed ion beam with parameters: ion energy 350-500 keV, ion current density at a target > 200 A/cm{sup 2}, pulse duration 60 ns, was used for metal deposition. The film deposition rate was 0.6-4.0 mm/s. Transmission electron microscopy/transmission electron diffraction investigations of the copper target-film system were performed. The impurity content in the film was determined by x-ray fluorescence analysis and secondary ion mass spectrometry. The angular distributions of the ablated plasma were measured. (author). 2 figs., 7 refs.

Characterization of the electrochemical behavior of coating by steel welding 308l and in presence of noble metals deposits

International Nuclear Information System (INIS)

Piedras, P.; Arganis J, C. R.

2014-10-01

In this work the oxide deposits and noble metals deposit were characterized (Ag and Pt) on a coating of stainless steel 308l that were deposited by the shield metal arc welding (SMAW) on steel A36 by means of scanning electron microscopy, energy-dispersive X-ray spectroscopy and X-ray diffraction. The extrapolation of Tafel technique was also used to obtain the corrosion potential (Ec) for the pre-rusty steel and for the samples with deposits of Pt and Ag under conditions of hydrogen water chemistry (HWC), demonstrating that this parameter diminishes with the presence of this deposits. (Author)

Thermal Gradient During Vacuum-Deposition Dramatically Enhances Charge Transport in Organic Semiconductors: Toward High-Performance N-Type Organic Field-Effect Transistors.

Science.gov (United States)

Kim, Joo-Hyun; Han, Singu; Jeong, Heejeong; Jang, Hayeong; Baek, Seolhee; Hu, Junbeom; Lee, Myungkyun; Choi, Byungwoo; Lee, Hwa Sung

2017-03-22

A thermal gradient distribution was applied to a substrate during the growth of a vacuum-deposited n-type organic semiconductor (OSC) film prepared from N,N'-bis(2-ethylhexyl)-1,7-dicyanoperylene-3,4:9,10-bis(dicarboxyimide) (PDI-CN2), and the electrical performances of the films deployed in organic field-effect transistors (OFETs) were characterized. The temperature gradient at the surface was controlled by tilting the substrate, which varied the temperature one-dimensionally between the heated bottom substrate and the cooled upper substrate. The vacuum-deposited OSC molecules diffused and rearranged on the surface according to the substrate temperature gradient, producing directional crystalline and grain structures in the PDI-CN2 film. The morphological and crystalline structures of the PDI-CN2 thin films grown under a vertical temperature gradient were dramatically enhanced, comparing with the structures obtained from either uniformly heated films or films prepared under a horizontally applied temperature gradient. The field effect mobilities of the PDI-CN2-FETs prepared using the vertically applied temperature gradient were as high as 0.59 cm 2 V -1 s -1 , more than a factor of 2 higher than the mobility of 0.25 cm 2 V -1 s -1 submitted to conventional thermal annealing and the mobility of 0.29 cm 2 V -1 s -1 from the horizontally applied temperature gradient.

Preparation of carbon-free TEM microgrids by metal sputtering

Energy Technology Data Exchange (ETDEWEB)

Janbroers, S., E-mail: stephan.janbroers@albemarle.com [Albemarle Catalysts B.V., Nieuwendammerkade 1-3, 1030 BE, Amsterdam (Netherlands); Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft (Netherlands); Kruijff, T.R. de; Xu, Q. [Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft (Netherlands); Kooyman, P.J. [DelftChemTech, Delft University of Technology, Julianalaan 136, 2628 BL, Delft (Netherlands); Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft (Netherlands); Zandbergen, H.W. [Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft (Netherlands)

2009-08-15

A new method for preparing carbon-free, temperature-stable Transmission Electron Microscope (TEM) grids is presented. An 80% Au/20% Pd metal film is deposited onto a 'holey' microgrid carbon supported on standard mixed-mesh Au TEM grids. Subsequently, the carbon film is selectively removed using plasma cleaning. In this way, an all-metal TEM film is made containing the 'same' microgrid as the original carbon film. Although electron transparency of the foil is reduced significantly, the open areas for TEM inspection of material over these areas are maintained. The metal foil can be prepared with various thicknesses and ensures good electrical conductivity. The new Au/Pd grids are stable to at least 775 K under vacuum conditions.

Experimental investigation on the motion of cathode spots in removing oxide film on metal surface by vacuum arc

International Nuclear Information System (INIS)

Shi Zongqian; Jia Shenli; Wang Lijun; Yuan Qingjun; Song Xiaochuan

2008-01-01

The motion of vacuum arc cathode spots has a very important influence on the efficiency of removing the oxide film on the metal surface. In this paper, the characteristics of cathode spot motion are investigated experimentally. Experiments were conducted in a detachable vacuum chamber with ac (50 Hz) arc current of 1 kA (rms). A stainless steel plate covered by an oxide layer was used as the cathode. The motion of cathode spots during the descaling process was photographed by a high-speed digital camera with an exposure time of 2 μs. Experimental results indicate that the motion of cathode spots is influenced by the interaction among individual cathode jets and the position of the anode as well as the surface condition. The waveform of arc voltage is also influenced by the motion of cathode spots

Metals distribution in Kumkol deposit petroleum; Raspredelenie metallov v nefti Kumkol`skogo mestorozhdeniya

Energy Technology Data Exchange (ETDEWEB)

Musaeva, Z G; Nadirov, A N; Ajdarbaev, A S

1997-11-04

Metals content in samples of Kumkol deposit petroleum is determined by the method of X-ray diffraction and neutron activation analysis. Specific consideration was devoted to nickel and vanadium. It is possible, that sources of these metals are various petroleum formation as well as both the absorbed or the got in stratum microelements. (author) 10 refs., 1 tab. Suppl. Neft` i gaz Kazakhstana

Effects of vacuum-ultraviolet irradiation on copper penetration into low-k dielectrics under bias-temperature stress

Energy Technology Data Exchange (ETDEWEB)

Guo, X.; Zheng, H.; Xue, P.; Shohet, J. L. [Plasma Processing and Technology Laboratory and Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706 (United States); King, S. W. [Logic Technology Development, Intel Corporation, Hillsboro, Oregon 97124 (United States); Nishi, Y. [Department of Electrical Engineering, Stanford University, Stanford, California 94305 (United States)

2015-01-05

The effects of vacuum-ultraviolet (VUV) irradiation on copper penetration into non-porous low-k dielectrics under bias-temperature stress (BTS) were investigated. By employing x-ray photoelectron spectroscopy depth-profile measurements on both as-deposited and VUV-irradiated SiCOH/Cu stacks, it was found that under the same BTS conditions, the diffusion depth of Cu into the VUV-irradiated SiCOH is higher than that of as-deposited SiCOH. On the other hand, under the same temperature-annealing stress (TS) without electric bias, the Cu distribution profiles in the VUV-irradiated SiCOH were same with that for the as-deposited SiCOH. The experiments suggest that in as-deposited SiCOH, the diffused Cu exists primarily in the atomic state, while in VUV-irradiated SiCOH, the diffused Cu is oxidized by the hydroxyl ions (OH{sup −}) generated from VUV irradiation and exists in the ionic state. The mechanisms for metal diffusion and ion injection in VUV irradiated low-k dielectrics are discussed.

Deposition of Y-Sm Oxide on Metallic Substrates for the YBCO Coated Conductor by MOCVD Method

International Nuclear Information System (INIS)

Choi, Jun Kyu; Kim, Min Woo; Jun, Byung Hyuk; Kim, Chan Joong; Lee, Hee Gyoun; Hong, Gye Won

2005-01-01

Complex single buffer composed of yttrium and samarium oxide was deposited on the metallic substrates by MOCVD (metal organic chemical vapor deposition) method using single liquid source. Two different types of the substrates with in-plane textures of about 8 - 10 degree of Ni and 3at.%W-Ni alloy were used. Y(tmhd: 2,2,6,6-tetramethyl-3,5-heptane dionate) 3 :Sm(tmhd) 3 of liquid source was adjusted to 0.4:0.6 to minimize the lattice mismatch between the complex single buffer and the YBCO. The epitaxial growth of (Y x Sm 1-x ) 2 O 3 was achieved at the temperature higher than 500 degree C in O 2 atmosphere. However, it was found that the formation of NiO accelerated with increasing deposition temperature. By supplying H 2 O vapor, this oxidation of the substrate could be suppressed throughout the deposition temperatures. We could get the epitaxial growth on pure Ni substrate without the formation of NiO. The competitive (222) and (400) growths were observed at the deposition temperatures of 650 - 750 degree C, but the (400) growth became dominant above 800 degree. The (Y x Sm 1-x ) 2 O 3 -buffered metallic substrates can be used as the buffer for YBCO coated conductor.