Quantum tunneling resonant electron transfer process in Lorentzian plasmas

International Nuclear Information System (INIS)

Hong, Woo-Pyo; Jung, Young-Dae

2014-01-01

The quantum tunneling resonant electron transfer process between a positive ion and a neutral atom collision is investigated in nonthermal generalized Lorentzian plasmas. The result shows that the nonthermal effect enhances the resonant electron transfer cross section in Lorentzian plasmas. It is found that the nonthermal effect on the classical resonant electron transfer cross section is more significant than that on the quantum tunneling resonant charge transfer cross section. It is shown that the nonthermal effect on the resonant electron transfer cross section decreases with an increase of the Debye length. In addition, the nonthermal effect on the quantum tunneling resonant electron transfer cross section decreases with increasing collision energy. The variation of nonthermal and plasma shielding effects on the quantum tunneling resonant electron transfer process is also discussed

Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System

Directory of Open Access Journals (Sweden)

Shiu-Ko JangJian

2007-01-01

Full Text Available The plasma clean in a plasma-enhanced chemical vapor deposition (PECVD system plays an important role to ensure the same chamber condition after numerous film depositions. The periodic and applicable plasma clean in deposition chamber also increases wafer yield due to less defect produced during the deposition process. In this study, the plasma clean rate (PCR of silicon oxide is investigated after the silicon nitride deposited on Cu and silicon oxide substrates by remote plasma system (RPS, respectively. The experimental results show that the PCR drastically decreases with Cu substrate compared to that with silicon oxide substrate after numerous silicon nitride depositions. To understand the substrate effect on PCR, the surface element analysis and bonding configuration are executed by X-ray photoelectron spectroscopy (XPS. The high resolution inductively coupled plasma mass spectrometer (HR-ICP-MS is used to analyze microelement of metal ions on the surface of shower head in the PECVD chamber. According to Cu substrate, the results show that micro Cu ion and the CuOx bonding can be detected on the surface of shower head. The Cu ion contamination might grab the fluorine radicals produced by NF3 ddissociation in the RPS and that induces the drastic decrease on PCR.

Resonant-cantilever bio/chemical sensors with an integrated heater for both resonance exciting optimization and sensing repeatability enhancement

International Nuclear Information System (INIS)

Yu Haitao; Li Xinxin; Gan Xiaohua; Liu Yongjing; Liu Xiang; Xu Pengcheng; Li Jungang; Liu Min

2009-01-01

With an integrated resonance exciting heater and a self-sensing piezoresistor, resonant micro-cantilever bio/chemical sensors are optimally designed and fabricated by micromachining techniques. This study is emphasized on the optimization of the integrated heating resistor. Previous research has put the heater at either the cantilever clamp end, the midpoint or the free end. Aiming at sufficiently high and stable resonant amplitude, our research indicates that the optimized location of the thermal-electric exciting resistor is the clamp end instead of other positions. By both theoretical analysis and resonance experiments where three heating resistors are placed at the three locations of the fabricated cantilever, it is clarified that the clamp end heating provides the most efficient resonance excitation in terms of resonant amplitude, Q-factor and resonance stability. Besides, the optimized combination of dc bias and ac voltage is determined by both analysis and experimental verification. With the optimized heating excitation, the resonant cantilever is used for biotin–avidin-specific detection, resulting in a ±0.1 Hz ultra-low noise floor of the frequency signal and a 130 fg mass resolution. In addition to resonance excitation, the heater is used to heat up the cantilever for speed-up desorption after detection that helps rapid and repeated sensing to chemical vapor. The clamp end is determined (by simulation) as the optimal heating location for uniform temperature distribution on the cantilever. Using the resonant cantilever, a rapid and repeated sensing experiment on dimethyl methylphosphonate (DMMP) vapor shows that a short-period heating at the detection interval significantly quickens the signal recovery and enhances the sensing repeatability

In vacuo substrate pretreatments for enhancing nanodiamond formation in electron cyclotron resonance plasma

International Nuclear Information System (INIS)

Teii, Kungen; Kouzuma, Yutaka; Uchino, Kiichiro

2006-01-01

Substrate pretreatment conditions at low pressures have been examined for enhancing nanocrystalline diamond formation on silicon in electron cyclotron resonance (ECR) plasma. Three kinds of pretreatments (I) exposure to an ECR H 2 plasma with application of a substrate bias from -100 to +30 V (II) hot-filament heating in H 2 gas, and (III) hot-filament heating in vacuum, were used alone or followed by carburization prior to a two-step process of ion-enhanced nucleation in an ECR plasma and subsequent growth in a hot-filament system. The number density of diamond particles after the final growth step was greatly increased up to the order of 10 7 -10 8 cm -2 when applying pretreatment (I) at the bias of 0 V corresponding to the ion-bombardment energy of around 10 eV. In this treatment, a clean and smooth surface with minimal damage was made by the dominance of anisotropic etching by hydrogen ions over isotropic etching by hydrogen atoms. The number density of diamond particles was still more increased when applying pretreatment (II), but the treated surface was unfavorably contaminated and roughened

Gold split-ring resonators (SRRs) as substrates for surface-enhanced raman scattering

KAUST Repository

Yue, Weisheng

2013-10-24

We used gold split ring resonators (SRRs) as substrates for surface-enhanced Raman scattering (SERS). The arrays of SRRs were fabricated by electron-beam lithography in combination with plasma etching. In the detection of rhodamine 6G (R6G) molecules, SERS enhancement factors of the order of 105 was achieved. This SERS enhancement increased as the size of the split gap decrease as a consequence of the matching between the resonance wavelength of the SRRs and the excitation wavelength of SERS. As the size of the split gap decreased, the localized surface plasmon resonance shifted to near the excitation wavelength and, thus, resulted in the increase in the electric field on the nanostructures. We used finite integration method (FIT) to simulate numerically the electromagnetic properties of the SRRs. The results of the simulation agreed well with our experimental observations. We anticipate this work will provide an approach to manipulate the SERS enhancement by modulating the size of split gap with SRRs without affecting the area and structural arrangement. © 2013 American Chemical Society.

Gold split-ring resonators (SRRs) as substrates for surface-enhanced raman scattering

KAUST Repository

Yue, Weisheng; Yang, Yang; Wang, Zhihong; Chen, Longqing; Wang, Xianbin

2013-01-01

We used gold split ring resonators (SRRs) as substrates for surface-enhanced Raman scattering (SERS). The arrays of SRRs were fabricated by electron-beam lithography in combination with plasma etching. In the detection of rhodamine 6G (R6G) molecules, SERS enhancement factors of the order of 105 was achieved. This SERS enhancement increased as the size of the split gap decrease as a consequence of the matching between the resonance wavelength of the SRRs and the excitation wavelength of SERS. As the size of the split gap decreased, the localized surface plasmon resonance shifted to near the excitation wavelength and, thus, resulted in the increase in the electric field on the nanostructures. We used finite integration method (FIT) to simulate numerically the electromagnetic properties of the SRRs. The results of the simulation agreed well with our experimental observations. We anticipate this work will provide an approach to manipulate the SERS enhancement by modulating the size of split gap with SRRs without affecting the area and structural arrangement. © 2013 American Chemical Society.

Plasma-enhanced chemical vapor deposition for YBCO film fabrication of superconducting fault-current limiter

Energy Technology Data Exchange (ETDEWEB)

Jun, Byung Hyuk; Kim, Chan Joong

2006-05-15

Since the high-temperature superconductor of oxide type was founded, many researches and efforts have been performed for finding its application field. The YBCO superconducting film fabricated on economic metal substrate with uniform critical current density is considered as superconducting fault-current limiter (SFCL). There are physical and chemical processes to fabricate superconductor film, and it is understood that the chemical methods are more economic to deposit large area. Among them, chemical vapor deposition (CVD) is a promising deposition method in obtaining film uniformity. To solve the problems due to the high deposition temperature of thermal CVD, plasma-enhanced chemical vapor deposition (PECVD) is suggested. This report describes the principle and fabrication trend of SFCL, example of YBCO film deposition by PECVD method, and principle of plasma deposition.

Nonlinear relativistic plasma resonance: Renormalization group approach

Energy Technology Data Exchange (ETDEWEB)

Metelskii, I. I., E-mail: metelski@lebedev.ru [Russian Academy of Sciences, Lebedev Physical Institute (Russian Federation); Kovalev, V. F., E-mail: vfkvvfkv@gmail.com [Dukhov All-Russian Research Institute of Automatics (Russian Federation); Bychenkov, V. Yu., E-mail: bychenk@lebedev.ru [Russian Academy of Sciences, Lebedev Physical Institute (Russian Federation)

2017-02-15

An analytical solution to the nonlinear set of equations describing the electron dynamics and electric field structure in the vicinity of the critical density in a nonuniform plasma is constructed using the renormalization group approach with allowance for relativistic effects of electron motion. It is demonstrated that the obtained solution describes two regimes of plasma oscillations in the vicinity of the plasma resonance— stationary and nonstationary. For the stationary regime, the spatiotemporal and spectral characteristics of the resonantly enhanced electric field are investigated in detail and the effect of the relativistic nonlinearity on the spatial localization of the energy of the plasma relativistic field is considered. The applicability limits of the obtained solution, which are determined by the conditions of plasma wave breaking in the vicinity of the resonance, are established and analyzed in detail for typical laser and plasma parameters. The applicability limits of the earlier developed nonrelativistic theories are refined.

Enhanced confinement in electron cyclotron resonance ion source plasma.

Science.gov (United States)

Schachter, L; Stiebing, K E; Dobrescu, S

2010-02-01

Power loss by plasma-wall interactions may become a limitation for the performance of ECR and fusion plasma devices. Based on our research to optimize the performance of electron cyclotron resonance ion source (ECRIS) devices by the use of metal-dielectric (MD) structures, the development of the method presented here, allows to significantly improve the confinement of plasma electrons and hence to reduce losses. Dedicated measurements were performed at the Frankfurt 14 GHz ECRIS using argon and helium as working gas and high temperature resistive material for the MD structures. The analyzed charge state distributions and bremsstrahlung radiation spectra (corrected for background) also clearly verify the anticipated increase in the plasma-electron density and hence demonstrate the advantage by the MD-method.

γ -Ray Generation from Plasma Wakefield Resonant Wiggler

Science.gov (United States)

Lei, Bifeng; Wang, Jingwei; Kharin, Vasily; Zepf, Matt; Rykovanov, Sergey

2018-03-01

A flexible gamma-ray radiation source based on the resonant laser-plasma wakefield wiggler is proposed. The wiggler is achieved by inducing centroid oscillations of a short laser pulse in a plasma channel. Electrons (self-)injected in such a wakefield experience both oscillations due to the transverse electric fields and energy gain due to the longitudinal electric field. The oscillations are significantly enhanced when the laser pulse centroid oscillations are in resonance with the electron betatron oscillations, extending the radiation spectrum to the gamma-ray range. The polarization of the radiation can be easily controlled by adjusting the injection of the laser pulse into the plasma channel.

Plasma enhanced chemical vapor deposition silicon oxynitride optimized for application in integrated optics

NARCIS (Netherlands)

Worhoff, Kerstin; Driessen, A.; Lambeck, Paul; Hilderink, L.T.H.; Linders, Petrus W.C.; Popma, T.J.A.

1999-01-01

Silicon Oxynitride layers are grown from SiH4/N2, NH3 and N2O by Plasma Enhanced Chemical Vapor Deposition. The process is optimized with respect to deposition of layers with excellent uniformity in the layer thickness, high homogeneity of the refractive index and good reproducibility of the layer

Study on stability of a-SiCOF films deposited by plasma enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Ding Shijin; Zhang Qingquan; Wang Pengfei; Zhang Wei; Wang Jitao

2001-01-01

Low-dielectric-constant a-SiCOF films have been prepared from TEOS, C 4 F 8 and Ar by using plasma enhanced chemical vapor deposition method. With the aid of X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR), the chemical bonding configuration, thermal stability and resistance to water of the films are explored

Room-temperature plasma-enhanced chemical vapor deposition of SiOCH films using tetraethoxysilane

International Nuclear Information System (INIS)

Yamaoka, K.; Yoshizako, Y.; Kato, H.; Tsukiyama, D.; Terai, Y.; Fujiwara, Y.

2006-01-01

Carbon-doped silicon oxide (SiOCH) thin films were deposited by room-temperature plasma-enhanced chemical vapor deposition (PECVD) using tetraethoxysilane (TEOS). The deposition rate and composition of the films strongly depended on radio frequency (RF) power. The films deposited at low RF power contained more CH n groups. The SiOCH films showed high etch rate and low refractive index in proportion to the carbon composition. The deposition with low plasma density and low substrate temperature is effective for SiOCH growth by PECVD using TEOS

Plasma Enhanced Chemical Vapour Deposition of Horizontally Aligned Carbon Nanotubes

Directory of Open Access Journals (Sweden)

Matthew T. Cole

2013-05-01

Full Text Available A plasma-enhanced chemical vapour deposition reactor has been developed to synthesis horizontally aligned carbon nanotubes. The width of the aligning sheath was modelled based on a collisionless, quasi-neutral, Child’s law ion sheath where these estimates were empirically validated by direct Langmuir probe measurements, thereby confirming the proposed reactors ability to extend the existing sheath fields by up to 7 mm. A 7 mbar growth atmosphere combined with a 25 W plasma permitted the concurrent growth and alignment of carbon nanotubes with electric fields of the order of 0.04 V μm−1 with linear packing densities of up to ~5 × 104 cm−1. These results open up the potential for multi-directional in situ alignment of carbon nanotubes providing one viable route to the fabrication of many novel optoelectronic devices.

One-step microwave plasma enhanced chemical vapor deposition (MW-PECVD) for transparent superhydrophobic surface

Science.gov (United States)

Thongrom, Sukrit; Tirawanichakul, Yutthana; Munsit, Nantakan; Deangngam, Chalongrat

2018-02-01

We demonstrate a rapid and environmental friendly fabrication technique to produce optically clear superhydrophobic surfaces using poly (dimethylsiloxane) (PDMS) as a sole coating material. The inert PDMS chain is transformed into a 3-D irregular solid network through microwave plasma enhanced chemical vapor deposition (MW-PECVD) process. Thanks to high electron density in the microwave-activated plasma, coating can be done in just a single step with rapid deposition rate, typically much shorter than 10 s. Deposited layers show excellent superhydrophobic properties with water contact angles of ∼170° and roll-off angles as small as ∼3°. The plasma-deposited films can be ultrathin with thicknesses under 400 nm, greatly diminishing the optical loss. Moreover, with appropriate coating conditions, the coating layer can even enhance the transmission over the entire visible spectrum due to a partial anti-reflection effect.

Moderate plasma treatment enhances the quality of optically detected magnetic resonance signals of nitrogen-vacancy centres in nanodiamonds

Science.gov (United States)

Sotoma, Shingo; Igarashi, Ryuji; Shirakawa, Masahiro

2016-05-01

We demonstrate that a moderate plasma treatment increases the quality of optically detected magnetic resonance (ODMR) signals from negatively charged nitrogen-vacancy centres in nanodiamonds (NDs). We measured the statistics of the ODMR spectra of 50-nm-size NDs before and after plasma treatment. We then evaluated each ODMR spectrum in terms of fluorescence and ODMR intensities, line width and signal-to-noise (SN) ratio. Our results showed that plasma treatment for more than 10 min contributes to higher-quality ODMR signals, i.e. signals that are brighter, stronger, sharper and have a higher SN ratio. We showed that such signal improvement is due to alteration of the surface chemical states of the NDs by the plasma treatment. Our study contributes to the advancement of biosensing applications using ODMR of NDs.

Measurements of time average series resonance effect in capacitively coupled radio frequency discharge plasma

International Nuclear Information System (INIS)

Bora, B.; Bhuyan, H.; Favre, M.; Wyndham, E.; Chuaqui, H.; Kakati, M.

2011-01-01

Self-excited plasma series resonance is observed in low pressure capacitvely coupled radio frequency discharges as high-frequency oscillations superimposed on the normal radio frequency current. This high-frequency contribution to the radio frequency current is generated by a series resonance between the capacitive sheath and the inductive and resistive bulk plasma. In this report, we present an experimental method to measure the plasma series resonance in a capacitively coupled radio frequency argon plasma by modifying the homogeneous discharge model. The homogeneous discharge model is modified by introducing a correction factor to the plasma resistance. Plasma parameters are also calculated by considering the plasma series resonances effect. Experimental measurements show that the self-excitation of the plasma series resonance, which arises in capacitive discharge due to the nonlinear interaction of plasma bulk and sheath, significantly enhances both the Ohmic and stochastic heating. The experimentally measured total dissipation, which is the sum of the Ohmic and stochastic heating, is found to increase significantly with decreasing pressure.

Surface plasma resonance enhanced photocurrent generation in NiO photoanode based solar cells

Energy Technology Data Exchange (ETDEWEB)

Wang, Zhong; Cui, Jin [Michael Grätzel Center for Mesoscopic Solar Cells, Wuhan National Laboratory for Optoelectronics Department, Huazhong University of Science and Technology, 1037 Luoyu Road, Wuhan 430074, Hubei (China); Li, Junpeng [State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Kunming Institute of Precious Metals, Kunming 650106 (China); Cao, Kun; Yuan, Shuai [Michael Grätzel Center for Mesoscopic Solar Cells, Wuhan National Laboratory for Optoelectronics Department, Huazhong University of Science and Technology, 1037 Luoyu Road, Wuhan 430074, Hubei (China); Cheng, Yibing [Michael Grätzel Center for Mesoscopic Solar Cells, Wuhan National Laboratory for Optoelectronics Department, Huazhong University of Science and Technology, 1037 Luoyu Road, Wuhan 430074, Hubei (China); Department of Materials Engineering, Monash University, Melbourne, Victoria 3800 (Australia); Wang, Mingkui, E-mail: mingkui.wang@mail.hust.edu.cn [Michael Grätzel Center for Mesoscopic Solar Cells, Wuhan National Laboratory for Optoelectronics Department, Huazhong University of Science and Technology, 1037 Luoyu Road, Wuhan 430074, Hubei (China)

2015-09-15

Highlights: • SPR effect from Au-nanostructures was first investigated in NiO-based solar cells. • Enhanced photocurrent generation was observed in p-DSC and perovskite solar cell. • Au-nanorods SPR effect induced charge kinetics were investigated. - Abstract: Surface plasma resonance (SPR) effect has been demonstrated to improve solar cell performance. This work reports on the SPR effect from Au nanorod@SiO{sub 2} on p-type dye-sensitized solar cells. Au nanorod@SiO{sub 2} works as an antenna to transform photons with long wavelength into electric field followed by an enhanced excitation of dye. The devices using the NiO electrode containing Au nanorod@SiO{sub 2} shows overall power conversion efficiencies of about 0.2% in combination with I{sup −}/I{sub 3}{sup −} electrolyte, and 0.29% with T{sup −}/T{sub 2} electrolyte, which are superior to those without adding Au nanorods. Detailed investigation including spectroscopy and transient photovoltage decay measurements reveals that plasma effect of Au nanorod@SiO{sub 2} contribute to charge injection efficiency, and thus on the photocurrent. The effect of Au NRs can be further extended to the inverted planar perovskite solar cells, showing obviously improvement in photocurrent.

Two dimensional radial gas flows in atmospheric pressure plasma-enhanced chemical vapor deposition

Science.gov (United States)

Kim, Gwihyun; Park, Seran; Shin, Hyunsu; Song, Seungho; Oh, Hoon-Jung; Ko, Dae Hong; Choi, Jung-Il; Baik, Seung Jae

2017-12-01

Atmospheric pressure (AP) operation of plasma-enhanced chemical vapor deposition (PECVD) is one of promising concepts for high quality and low cost processing. Atmospheric plasma discharge requires narrow gap configuration, which causes an inherent feature of AP PECVD. Two dimensional radial gas flows in AP PECVD induces radial variation of mass-transport and that of substrate temperature. The opposite trend of these variations would be the key consideration in the development of uniform deposition process. Another inherent feature of AP PECVD is confined plasma discharge, from which volume power density concept is derived as a key parameter for the control of deposition rate. We investigated deposition rate as a function of volume power density, gas flux, source gas partial pressure, hydrogen partial pressure, plasma source frequency, and substrate temperature; and derived a design guideline of deposition tool and process development in terms of deposition rate and uniformity.

Synthesis of electro-active manganese oxide thin films by plasma enhanced chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Merritt, Anna R. [Energetics Research Division, Naval Air Warfare Center Weapons Division, China Lake, CA 93555 (United States); Rajagopalan, Ramakrishnan [Department of Engineering, The Pennsylvania State University, Dubois, PA 15801 (United States); Materials Research Institute, The Pennsylvania State University, University Park, PA 16802 (United States); Carter, Joshua D. [Energetics Research Division, Naval Air Warfare Center Weapons Division, China Lake, CA 93555 (United States)

2014-04-01

The good stability, cyclability and high specific capacitance of manganese oxide (MnO{sub x}) has recently promoted a growing interest in utilizing MnO{sub x} in asymmetric supercapacitor electrodes. Several literature reports have indicated that thin film geometries of MnO{sub x} provide specific capacitances that are much higher than bulk MnO{sub x} powders. Plasma enhanced chemical vapor deposition (PECVD) is a versatile technique for the production of metal oxide thin films with high purity and controllable thickness. In this work, MnO{sub x} thin films deposited by PECVD from a methylcyclopentadienyl manganese tricarbonyl precursor are presented and the effect of processing conditions on the quality of MnO{sub x} films is described. The film purity and oxidation state of the MnO{sub x} films were studied by Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy. Preliminary electrochemical testing of MnO{sub x} films deposited on carbon fiber electrodes in aqueous electrolytes indicates that the PECVD synthesized films are electrochemically active. - Highlights: • Plasma enhanced chemical vapor deposition of manganese oxide thin films. • Higher plasma power and chamber pressure increase deposition rate. • Manganese oxide thin films are electrochemically active. • Best electrochemical performance observed for pure film with low stress • Lower capacitance observed at higher scan rates despite thin film geometry.

LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition

Czech Academy of Sciences Publication Activity Database

Stuchlík, Jiří; Ledinský, Martin; Honda, Shinya; Drbohlav, Ivo; Mates, Tomáš; Fejfar, Antonín; Hruška, Karel; Stuchlíková, The-Ha; Kočka, Jan

2009-01-01

Roč. 517, č. 24 (2009), s. 6829-6832 ISSN 0040-6090 R&D Projects: GA AV ČR KAN400100701; GA ČR(CZ) GD202/05/H003; GA MŠk LC510; GA AV ČR IAA1010413 Institutional research plan: CEZ:AV0Z10100521 Keywords : amorphous hydrogenated silicon * atomic force microscopy * plasma-enhanced chemical vapour deposition, * nucleation * Raman scattering * lithium fluoride Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.727, year: 2009

Experimental setup for producing tungsten coated graphite tiles using plasma enhanced chemical vapor deposition technique for fusion plasma applications

International Nuclear Information System (INIS)

Chauhan, Sachin Singh; Sharma, Uttam; Choudhary, K.K.; Sanyasi, A.K.; Ghosh, J.; Sharma, Jayshree

2013-01-01

Plasma wall interaction (PWI) in fusion grade machines puts stringent demands on the choice of materials in terms of high heat load handling capabilities and low sputtering yields. Choice of suitable material still remains a challenge and open topic of research for the PWI community. Carbon fibre composites (CFC), Beryllium (Be), and Tungsten (W) are now being considered as first runners for the first wall components of future fusion machines. Tungsten is considered to be one of the suitable materials for the job because of its superior properties than carbon like low physical sputtering yield and high sputter energy threshold, high melting point, fairly high re-crystallization temperature, low fuel retention capabilities, low chemical sputtering with hydrogen and its isotopes and most importantly the reparability with various plasma techniques both ex-situ and in-situ. Plasma assisted chemical vapour deposition is considered among various techniques as the most preferable technique for fabricating tungsten coated graphite tiles to be used as tokamak first wall and target components. These coated tiles are more favourable compared to pure tungsten due to their light weight and easier machining. A system has been designed, fabricated and installed at SVITS, Indore for producing tungsten coated graphite tiles using Plasma Enhanced Chemical Vapor Deposition (PE-CVD) technique for Fusion plasma applications. The system contains a vacuum chamber, a turbo-molecular pump, two electrodes, vacuum gauges, mass analyzer, mass flow controllers and a RF power supply for producing the plasma using hydrogen gas. The graphite tiles will be put on one of the electrodes and WF6 gas will be inserted in a controlled manner in the hydrogen plasma to achieve the tungsten-coating with WF6 dissociation. The system is integrated at SVITS, Indore and a vacuum of the order of 3*10 -6 is achieved and glow discharge plasma has been created to test all the sub-systems. The system design with

One-step synthesis of chlorinated graphene by plasma enhanced chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Fan, Liwei; Zhang, Hui; Zhang, Pingping; Sun, Xuhui, E-mail: xhsun@suda.edu.cn

2015-08-30

Highlights: • We developed a simple approach to synthesize the single layer chlorinated graphene. • CuCl{sub 2} on Cu surface is used as Cl source under the plasma treatment. • The formation of covalent C−Cl bond has been investigated by Raman and XPS. • Raman results indicate the p-type doping effect of chlorination. - Abstract: We developed an approach to synthesize the chlorinated single layer graphene (Cl-G) by one-step plasma enhanced chemical vapor deposition. Copper foil was simply treated with hydrochloric acid and then CuCl{sub 2} formed on the surface was used as Cl source under the assistance of plasma treatment. Compared with other two-step methods by post plasma/photochemical treatment of CVD-grown single layer graphene (SLG), one-step Cl-G synthesis approach is quite straightforward and effective. X-ray photoelectron spectroscopy (XPS) revealed that ∼2.45 atom% Cl remained in SLG. Compared with the pristine SLG, the obvious blue shifts of G band and 2D band along with the appearance of D’ band and D + G band in the Raman spectra indicate p-type doping of Cl-G.

Growth of highly oriented carbon nanotubes by plasma-enhanced hot filament chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Huang, Z.P.; Xu, J.W.; Ren, Z.F.; Wang, J.H. [Materials Synthesis Laboratory, Departments of Physics and Chemistry, and Center for Advanced Photonic and Electronic Materials (CAPEM), State University of New York at Buffalo, Buffalo, New York 14260 (United States); Siegal, M.P.; Provencio, P.N. [Sandia National Laboratories, Albuquerque, New Mexico 87185-1421 (United States)

1998-12-01

Highly oriented, multiwalled carbon nanotubes were grown on polished polycrystalline and single crystal nickel substrates by plasma enhanced hot filament chemical vapor deposition at temperatures below 666 {degree}C. The carbon nanotubes range from 10 to 500 nm in diameter and 0.1 to 50 {mu}m in length depending on growth conditions. Acetylene is used as the carbon source for the growth of the carbon nanotubes and ammonia is used for dilution gas and catalysis. The plasma intensity, acetylene to ammonia gas ratio, and their flow rates, etc. affect the diameters and uniformity of the carbon nanotubes. {copyright} {ital 1998 American Institute of Physics.}

Structural and optical characterization of self-assembled Ge nanocrystal layers grown by plasma-enhanced chemical vapor deposition

NARCIS (Netherlands)

Saeed, S.; Buters, F.; Dohnalova, K.; Wosinski, L.; Gregorkiewicz, T.

2014-01-01

We present a structural and optical study of solid-state dispersions of Ge nanocrystals prepared by plasma-enhanced chemical vapor deposition. Structural analysis shows the presence of nanocrystalline germanium inclusions embedded in an amorphous matrix of Si-rich SiO2. Optical characterization

Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition

NARCIS (Netherlands)

Ponomarev, M.; Verheijen, M.A.; Keuning, W.; Sanden, van de M.C.M.; Creatore, M.

2012-01-01

Aluminum-doped ZnO (ZnO:Al) grown by chemical vapor deposition (CVD) generally exhibit a major drawback, i.e., a gradient in resistivity extending over a large range of film thickness. The present contribution addresses the plasma-enhanced CVD deposition of ZnO:Al layers by focusing on the control

The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films

Energy Technology Data Exchange (ETDEWEB)

Jiang Hao [Materials Sci and Tech Applications, LLC, 409 Maple Springs Drive, Dayton OH 45458 (United States)]. E-mail: hao.jiang@wpafb.af.mil; Hong Lianggou [Materials Sci and Tech Applications, LLC, 409 Maple Springs Drive, Dayton OH 45458 (United States); Venkatasubramanian, N. [Research Institute, University of Dayton, 300 College Park, Dayton, OH 45469-0168 (United States); Grant, John T. [Research Institute, University of Dayton, 300 College Park, Dayton, OH 45469-0168 (United States); Eyink, Kurt [Air Force Research Laboratory, Materials Directorate, 3005 Hobson Way, Wright-Patterson Air Force Base, OH 45433-7707 (United States); Wiacek, Kevin [Air Force Research Laboratory, Propulsion Directorate, 1950 Fifth Street, Wright-Patterson Air Force Base, OH 45433-7251 (United States); Fries-Carr, Sandra [Air Force Research Laboratory, Propulsion Directorate, 1950 Fifth Street, Wright-Patterson Air Force Base, OH 45433-7251 (United States); Enlow, Jesse [Air Force Research Laboratory, Materials Directorate, 3005 Hobson Way, Wright-Patterson Air Force Base, OH 45433-7707 (United States); Bunning, Timothy J. [Air Force Research Laboratory, Materials Directorate, 3005 Hobson Way, Wright-Patterson Air Force Base, OH 45433-7707 (United States)

2007-02-26

Polymer dielectric films fabricated by plasma enhanced chemical vapor deposition (PECVD) have unique properties due to their dense crosslinked bulk structure. These spatially uniform films exhibit good adhesion to a variety of substrates, excellent chemical inertness, high thermal resistance, and are formed from an inexpensive, solvent-free, room temperature process. In this work, we studied the dielectric properties of plasma polymerized (PP) carbon-based polymer thin films prepared from two precursors, benzene and octafluorocyclobutane. Two different monomer feed locations, directly in the plasma zone or in the downstream region (DS) and two different pressures, 80 Pa (high pressure) or 6.7 Pa (low pressure), were used. The chemical structure of the PECVD films was examined by X-ray photoelectron spectroscopy and Fourier-transform infrared spectroscopy. The dielectric constant ({epsilon} {sub r}) and dielectric loss (tan {delta}) of the films were investigated over a range of frequencies up to 1 MHz and the dielectric strength (breakdown voltage) (F {sub b}) was characterized by the current-voltage method. Spectroscopic ellipsometry was performed to determine the film thickness and refractive index. Good dielectric properties were exhibited, as PP-benzene films formed in the high pressure, DS region showed a F{sub b} of 610 V/{mu}m, an {epsilon} {sub r} of 3.07, and a tan {delta} of 7.0 x 10{sup -3} at 1 kHz. The PECVD processing pressure has a significant effect on final film structure and the film's physical density has a strong impact on dielectric breakdown strength. Also noted was that the residual oxygen content in the PP-benzene films significantly affected the frequency dependences of the dielectric constant and loss.

The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films

International Nuclear Information System (INIS)

Jiang Hao; Hong Lianggou; Venkatasubramanian, N.; Grant, John T.; Eyink, Kurt; Wiacek, Kevin; Fries-Carr, Sandra; Enlow, Jesse; Bunning, Timothy J.

2007-01-01

Polymer dielectric films fabricated by plasma enhanced chemical vapor deposition (PECVD) have unique properties due to their dense crosslinked bulk structure. These spatially uniform films exhibit good adhesion to a variety of substrates, excellent chemical inertness, high thermal resistance, and are formed from an inexpensive, solvent-free, room temperature process. In this work, we studied the dielectric properties of plasma polymerized (PP) carbon-based polymer thin films prepared from two precursors, benzene and octafluorocyclobutane. Two different monomer feed locations, directly in the plasma zone or in the downstream region (DS) and two different pressures, 80 Pa (high pressure) or 6.7 Pa (low pressure), were used. The chemical structure of the PECVD films was examined by X-ray photoelectron spectroscopy and Fourier-transform infrared spectroscopy. The dielectric constant (ε r ) and dielectric loss (tan δ) of the films were investigated over a range of frequencies up to 1 MHz and the dielectric strength (breakdown voltage) (F b ) was characterized by the current-voltage method. Spectroscopic ellipsometry was performed to determine the film thickness and refractive index. Good dielectric properties were exhibited, as PP-benzene films formed in the high pressure, DS region showed a F b of 610 V/μm, an ε r of 3.07, and a tan δ of 7.0 x 10 -3 at 1 kHz. The PECVD processing pressure has a significant effect on final film structure and the film's physical density has a strong impact on dielectric breakdown strength. Also noted was that the residual oxygen content in the PP-benzene films significantly affected the frequency dependences of the dielectric constant and loss

Raman enhancement on ultra-clean graphene quantum dots produced by quasi-equilibrium plasma-enhanced chemical vapor deposition.

Science.gov (United States)

Liu, Donghua; Chen, Xiaosong; Hu, Yibin; Sun, Tai; Song, Zhibo; Zheng, Yujie; Cao, Yongbin; Cai, Zhi; Cao, Min; Peng, Lan; Huang, Yuli; Du, Lei; Yang, Wuli; Chen, Gang; Wei, Dapeng; Wee, Andrew Thye Shen; Wei, Dacheng

2018-01-15

Graphene is regarded as a potential surface-enhanced Raman spectroscopy (SERS) substrate. However, the application of graphene quantum dots (GQDs) has had limited success due to material quality. Here, we develop a quasi-equilibrium plasma-enhanced chemical vapor deposition method to produce high-quality ultra-clean GQDs with sizes down to 2 nm directly on SiO 2 /Si, which are used as SERS substrates. The enhancement factor, which depends on the GQD size, is higher than conventional graphene sheets with sensitivity down to 1 × 10 -9  mol L -1 rhodamine. This is attributed to the high-quality GQDs with atomically clean surfaces and large number of edges, as well as the enhanced charge transfer between molecules and GQDs with appropriate diameters due to the existence of Van Hove singularities in the electronic density of states. This work demonstrates a sensitive SERS substrate, and is valuable for applications of GQDs in graphene-based photonics and optoelectronics.

Plasma-enhanced chemical vapor deposited silicon oxynitride films for optical waveguide bridges for use in mechanical sensors

DEFF Research Database (Denmark)

Storgaard-Larsen, Torben; Leistiko, Otto

1997-01-01

In this paper the influence of RF power, ammonia flow, annealing temperature, and annealing time on the optical and mechanical properties of plasma-enhanced chemically vapor deposited silicon oxynitride films, is presented. A low refractive index (1.47 to 1.48) film having tensile stress has been...

Tungsten Deposition on Graphite using Plasma Enhanced Chemical Vapour Deposition

International Nuclear Information System (INIS)

Sharma, Uttam; Chauhan, Sachin S; Sharma, Jayshree; Sanyasi, A K; Ghosh, J; Choudhary, K K; Ghosh, S K

2016-01-01

The tokamak concept is the frontrunner for achieving controlled thermonuclear reaction on earth, an environment friendly way to solve future energy crisis. Although much progress has been made in controlling the heated fusion plasmas (temperature ∼ 150 million degrees) in tokamaks, technological issues related to plasma wall interaction topic still need focused attention. In future, reactor grade tokamak operational scenarios, the reactor wall and target plates are expected to experience a heat load of 10 MW/m 2 and even more during the unfortunate events of ELM's and disruptions. Tungsten remains a suitable choice for the wall and target plates. It can withstand high temperatures, its ductile to brittle temperature is fairly low and it has low sputtering yield and low fuel retention capabilities. However, it is difficult to machine tungsten and hence usages of tungsten coated surfaces are mostly desirable. To produce tungsten coated graphite tiles for the above-mentioned purpose, a coating reactor has been designed, developed and made operational at the SVITS, Indore. Tungsten coating on graphite has been attempted and successfully carried out by using radio frequency induced plasma enhanced chemical vapour deposition (rf -PECVD) for the first time in India. Tungsten hexa-fluoride has been used as a pre-cursor gas. Energy Dispersive X-ray spectroscopy (EDS) clearly showed the presence of tungsten coating on the graphite samples. This paper presents the details of successful operation and achievement of tungsten coating in the reactor at SVITS. (paper)

Microwave plasma-enhanced chemical vapour deposition growth of carbon nanostructures

Directory of Open Access Journals (Sweden)

Shivan R. Singh

2010-05-01

Full Text Available The effect of various input parameters on the production of carbon nanostructures using a simple microwave plasma-enhanced chemical vapour deposition technique has been investigated. The technique utilises a conventional microwave oven as the microwave energy source. The developed apparatus is inexpensive and easy to install and is suitable for use as a carbon nanostructure source for potential laboratory-based research of the bulk properties of carbon nanostructures. A result of this investigation is the reproducibility of specific nanostructures with the variation of input parameters, such as carbon-containing precursor and support gas flow rate. It was shown that the yield and quality of the carbon products is directly controlled by input parameters. Transmission electron microscopy and scanning electron microscopy were used to analyse the carbon products; these were found to be amorphous, nanotubes and onion-like nanostructures.

Effect of plasma composition on nanocrystalline diamond layers deposited by a microwave linear antenna plasma-enhanced chemical vapour deposition system

Czech Academy of Sciences Publication Activity Database

Taylor, Andrew; Ashcheulov, Petr; Čada, Martin; Fekete, Ladislav; Hubík, Pavel; Klimša, Ladislav; Olejníček, Jiří; Remeš, Zdeněk; Jirka, Ivan; Janíček, P.; Bedel-Pereira, E.; Kopeček, Jaromír; Mistrík, J.; Mortet, Vincent

2015-01-01

Roč. 212, č. 11 (2015), s. 2418-2423 ISSN 1862-6300 R&D Projects: GA ČR GA13-31783S; GA MŠk LO1409 Grant - others:FUNBIO(XE) CZ.2.16/3.1.00/21568 Institutional support: RVO:68378271 ; RVO:61388955 Keywords : diamond * electrical conductivity * nanocrystalline materials * optical emission spectroscopy * plasma enhanced chemical vapour deposition * SiC Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.648, year: 2015

Comparative X-ray photoelectron spectroscopy study of plasma enhanced chemical vapor deposition and micro pressure chemical vapor deposition of phosphorus silicate glass layers after rapid thermal annealing

International Nuclear Information System (INIS)

Beshkov, G.; Krastev, V.; Gogova, D.; Talik, E.; Adamies, M.

2008-01-01

In this paper the bonding state of Phosphorus Silicate Glass (PSG) layers obtained by two different technological approaches, i.e. in two types of reactors: Plasma Enhanced Chemical Vapor Deposition (PECVD) and Micro Pressure Chemical Vapor Deposition (MPCVD) are investigated employing XPS and AES. The PSG layers are deposited at 380 0 C and 420 0 C in corresponding reactors. XPS and AES analyses show that Si2p peak recorded from PECVD layers are not as expected at their position characteristics of silicon dioxide but instead they are at the characteristic of elemental silicon. Plasma enhancement during deposition leads to less oxidized and more inhomogeneous layer. After rapid thermal annealing the Si2p peak is situated at position characteristic of silicon dioxide. (authors)

Theoretical approach for plasma series resonance effect in geometrically symmetric dual radio frequency plasma

International Nuclear Information System (INIS)

Bora, B.; Bhuyan, H.; Favre, M.; Wyndham, E.; Chuaqui, H.

2012-01-01

Plasma series resonance (PSR) effect is well known in geometrically asymmetric capacitively couple radio frequency plasma. However, plasma series resonance effect in geometrically symmetric plasma has not been properly investigated. In this work, a theoretical approach is made to investigate the plasma series resonance effect and its influence on Ohmic and stochastic heating in geometrically symmetric discharge. Electrical asymmetry effect by means of dual frequency voltage waveform is applied to excite the plasma series resonance. The results show considerable variation in heating with phase difference between the voltage waveforms, which may be applicable in controlling the plasma parameters in such plasma.

Polyethylene Oxide Films Polymerized by Radio Frequency Plasma-Enhanced Chemical Vapour Phase Deposition and Its Adsorption Behaviour of Platelet-Rich Plasma

International Nuclear Information System (INIS)

Wen-Juan, Hu; Fen-Yan, Xie; Qiang, Chen; Jing, Weng

2008-01-01

We present polyethylene oxide (PEO) functional films polymerized by rf plasma-enhanced vapour chemical deposition (rf-PECVD) on p-Si (100) surface with precursor ethylene glycol dimethyl ether (EGDME) and diluted Ar in pulsed plasma mode. The influences of discharge parameters on the film properties and compounds are investigated. The film structure is analysed by Fourier transform infrared (FTIR) spectroscopy. The water contact angle measurement and atomic force microscope (AFM) are employed to examine the surface polarity and to detect surface morphology, respectively. It is concluded that the smaller duty cycle in pulsed plasma mode contributes to the rich C-O-C (EO) group on the surfaces. As an application, the adsorption behaviour of platelet-rich plasma on plasma polymerization films performed in-vitro is explored. The shapes of attached cells are studied in detail by an optic invert microscope, which clarifies that high-density C-O-C groups on surfaces are responsible for non-fouling adsorption behaviour of the PEO films

Polyethylene Oxide Films Polymerized by Radio Frequency Plasma-Enhanced Chemical Vapour Phase Deposition and Its Adsorption Behaviour of Platelet-Rich Plasma

Science.gov (United States)

Hu, Wen-Juan; Xie, Fen-Yan; Chen, Qiang; Weng, Jing

2008-10-01

We present polyethylene oxide (PEO) functional films polymerized by rf plasma-enhanced vapour chemical deposition (rf-PECVD) on p-Si (100) surface with precursor ethylene glycol dimethyl ether (EGDME) and diluted Ar in pulsed plasma mode. The influences of discharge parameters on the film properties and compounds are investigated. The film structure is analysed by Fourier transform infrared (FTIR) spectroscopy. The water contact angle measurement and atomic force microscope (AFM) are employed to examine the surface polarity and to detect surface morphology, respectively. It is concluded that the smaller duty cycle in pulsed plasma mode contributes to the rich C-O-C (EO) group on the surfaces. As an application, the adsorption behaviour of platelet-rich plasma on plasma polymerization films performed in-vitro is explored. The shapes of attached cells are studied in detail by an optic invert microscope, which clarifies that high-density C-O-C groups on surfaces are responsible for non-fouling adsorption behaviour of the PEO films.

Polycrystalline AlN films with preferential orientation by plasma enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Sanchez, G.; Wu, A.; Tristant, P.; Tixier, C.; Soulestin, B.; Desmaison, J.; Bologna Alles, A.

2008-01-01

AlN thin films for acoustic wave devices were prepared by Microwave Plasma Enhanced Chemical Vapor Deposition under different process conditions, employing Si (100) and Pt (111)/SiO 2 /Si (100) substrates. The films were characterized by X-ray diffraction, Fourier transform infrared transmission spectroscopy, atomic force microscopy, scanning electron microscopy, and transmission electron microscopy. The values of the distance between the plasma and the tri-methyl-aluminum precursor injector, the radiofrequency bias potential, and the substrate temperature were central in the development of polycrystalline films. The choice of the chamber total pressure during deposition allowed for the development of two different crystallographic orientations, i.e., or . The film microstructures exhibited in general a column-like growth with rounded tops, an average grain size of about 40 nm, and a surface roughness lower than 20 nm under the best conditions

Stochastic resonance in small-world neuronal networks with hybrid electrical–chemical synapses

International Nuclear Information System (INIS)

Wang, Jiang; Guo, Xinmeng; Yu, Haitao; Liu, Chen; Deng, Bin; Wei, Xile; Chen, Yingyuan

2014-01-01

Highlights: •We study stochastic resonance in small-world neural networks with hybrid synapses. •The resonance effect depends largely on the probability of chemical synapse. •An optimal chemical synapse probability exists to evoke network resonance. •Network topology affects the stochastic resonance in hybrid neuronal networks. - Abstract: The dependence of stochastic resonance in small-world neuronal networks with hybrid electrical–chemical synapses on the probability of chemical synapse and the rewiring probability is investigated. A subthreshold periodic signal is imposed on one single neuron within the neuronal network as a pacemaker. It is shown that, irrespective of the probability of chemical synapse, there exists a moderate intensity of external noise optimizing the response of neuronal networks to the pacemaker. Moreover, the effect of pacemaker driven stochastic resonance of the system depends largely on the probability of chemical synapse. A high probability of chemical synapse will need lower noise intensity to evoke the phenomenon of stochastic resonance in the networked neuronal systems. In addition, for fixed noise intensity, there is an optimal chemical synapse probability, which can promote the propagation of the localized subthreshold pacemaker across neural networks. And the optimal chemical synapses probability turns even larger as the coupling strength decreases. Furthermore, the small-world topology has a significant impact on the stochastic resonance in hybrid neuronal networks. It is found that increasing the rewiring probability can always enhance the stochastic resonance until it approaches the random network limit

Enhanced absorption in Au nanoparticles/a-Si:H/c-Si heterojunction solar cells exploiting Au surface plasmon resonance

Energy Technology Data Exchange (ETDEWEB)

Losurdo, Maria; Giangregorio, Maria M.; Bianco, Giuseppe V.; Sacchetti, Alberto; Capezzuto, Pio; Bruno, Giovanni [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari (Italy)

2009-10-15

Au nanoparticles (NPs)/(n-type)a-Si:H/(p-type)c-Si heterojunctions have been deposited combining plasma-enhanced chemical-vapour deposition (PECVD) with Au sputtering. We demonstrate that a density of {proportional_to}1.3 x 10{sup 11} cm{sup -2} of Au nanoparticles with an approximately 20 nm diameter deposited onto (n-type)a-Si:H/(p-type)c-Si heterojunctions enhance performance exploiting the improved absorption of light by the surface plasmon resonance of Au NPs. In particular, Au NPs/(n-type)a-Si:H/(p-type)c-Si show an enhancement of 20% in the short-circuit current, J{sub SC}, 25% in the power output, P{sub max} and 3% in the fill factor, FF, compared to heterojunctions without Au NPs. Structures have been characterized by spectroscopic ellipsometry, atomic force microscopy and current-voltage (I-V) measurements to correlate the plasmon resonance-induced enhanced absorption of light with photovoltaic performance. (author)

Fundamental aspects of plasma chemical physics transport

CERN Document Server

Capitelli, Mario; Laricchiuta, Annarita

2013-01-01

Fundamental Aspects of Plasma Chemical Physics: Tranpsort develops basic and advanced concepts of plasma transport to the modern treatment of the Chapman-Enskog method for the solution of the Boltzmann transport equation. The book invites the reader to consider actual problems of the transport of thermal plasmas with particular attention to the derivation of diffusion- and viscosity-type transport cross sections, stressing the role of resonant charge-exchange processes in affecting the diffusion-type collision calculation of viscosity-type collision integrals. A wide range of topics is then discussed including (1) the effect of non-equilibrium vibrational distributions on the transport of vibrational energy, (2) the role of electronically excited states in the transport properties of thermal plasmas, (3) the dependence of transport properties on the multitude of Saha equations for multi-temperature plasmas, and (4) the effect of the magnetic field on transport properties. Throughout the book, worked examples ...

Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films

Energy Technology Data Exchange (ETDEWEB)

Broas, Mikael, E-mail: mikael.broas@aalto.fi; Vuorinen, Vesa [Department of Electrical Engineering and Automation, Aalto University, P.O. Box 13500, FIN-00076 Aalto, Espoo (Finland); Sippola, Perttu; Pyymaki Perros, Alexander; Lipsanen, Harri [Department of Micro- and Nanosciences, Aalto University, P.O. Box 13500, FIN-00076 Aalto, Espoo (Finland); Sajavaara, Timo [Department of Physics, University of Jyväskylä, P.O. Box 35, FIN-40014 Jyväskylä (Finland); Paulasto-Kröckel, Mervi [Department of Electrical Engineering and Automation, Aalto University. P.O. Box 13500, FIN-00076 Aalto, Espoo (Finland)

2016-07-15

Plasma-enhanced atomic layer deposition was utilized to grow aluminum nitride (AlN) films on Si from trimethylaluminum and N{sub 2}:H{sub 2} plasma at 200 °C. Thermal treatments were then applied on the films which caused changes in their chemical composition and nanostructure. These changes were observed to manifest in the refractive indices and densities of the films. The AlN films were identified to contain light element impurities, namely, H, C, and excess N due to nonideal precursor reactions. Oxygen contamination was also identified in the films. Many of the embedded impurities became volatile in the elevated annealing temperatures. Most notably, high amounts of H were observed to desorb from the AlN films. Furthermore, dinitrogen triple bonds were identified with infrared spectroscopy in the films. The triple bonds broke after annealing at 1000 °C for 1 h which likely caused enhanced hydrolysis of the films. The nanostructure of the films was identified to be amorphous in the as-deposited state and to become nanocrystalline after 1 h of annealing at 1000 °C.

Characterization of electron cyclotron resonance hydrogen plasmas

International Nuclear Information System (INIS)

Outten, C.A.

1990-01-01

Electron cyclotron resonance (ECR) plasmas yield low energy and high ion density plasmas. The characteristics downstream of an ECR hydrogen plasma were investigated as a function of microwave power and magnetic field. A fast-injection Langmuir probe and a carbon resistance probe were used to determine plasma potential (V p ), electron density (N e ), electron temperature (T e ), ion energy (T i ), and ion fluence. Langmuir probe results showed that at 17 cm downstream from the ECR chamber the plasma characteristics are approximately constant across the center 7 cm of the plasma for 50 Watts of absorbed power. These results gave V p = 30 ± 5 eV, N e = 1 x 10 8 cm -3 , and T e = 10--13 eV. In good agreement with the Langmuir probe results, carbon resistance probes have shown that T i ≤ 50 eV. Also, based on hydrogen chemical sputtering of carbon, the hydrogen (ion and energetic neutrals) fluence rate was determined to be 1 x 10 16 /cm 2 -sec. at a pressure of 1 x 10 -4 Torr and for 50 Watts of absorbed power. 19 refs

Growth and characterization of stoichiometric BCN films on highly oriented pyrolytic graphite by radiofrequency plasma enhanced chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Mannan, Md. Abdul, E-mail: amannan75@yahoo.co [Department of Chemistry and Applied Chemistry, Faculty of Science and Engineering, Saga University, 1 Honjo, Saga 840-8502 (Japan); Synchrotron Radiation Research Unit, Quantum Beam Science Directorate, Japan Atomic Energy Agency, Tokai-mura, Naka-gun, Ibaraki 319-1195 (Japan); Noguchi, Hideyuki; Kida, Tetsuya; Nagano, Masamitsu [Department of Chemistry and Applied Chemistry, Faculty of Science and Engineering, Saga University, 1 Honjo, Saga 840-8502 (Japan); Hirao, Norie; Baba, Yuji [Synchrotron Radiation Research Unit, Quantum Beam Science Directorate, Japan Atomic Energy Agency, Tokai-mura, Naka-gun, Ibaraki 319-1195 (Japan)

2010-05-31

Hexagonal boron carbonitride (h-BCN) hybrid films have been synthesized on highly oriented pyrolytic graphite by radiofrequency plasma enhanced chemical vapor deposition using tris-(dimethylamino)borane as a single-source molecular precursor. The films were characterized by X-ray photoelectron spectroscopy (XPS), near-edge X-ray absorption fine structure (NEXAFS) and Raman spectroscopic measurements. XPS measurement showed that the B atoms were bonded to C and N atoms to form the sp{sup 2}-B-C-N atomic hybrid chemical environment. The atomic composition estimated from the XPS of the typical sample was found to be almost B{sub 1}C{sub 1}N{sub 1}. NEXAFS spectra of the B K-edge and the N K-edge had the peaks due to the {pi}* and {sigma}* resonances of sp{sup 2} hybrid orbitals implying the existence of the sp{sup 2} hybrid configurations of h-BCN around the B atoms. The G band at 1592 and D band at 1352 cm{sup -1} in the Raman spectra also suggested the presence of the graphite-like sp{sup 2}-B-C-N atomic hybrid bonds. The films consisted of micrometer scale crystalline structure of around 10 {mu}m thick has been confirmed by the field emission scanning electron microscopy.

Surface-Enhanced Raman Scattering Using Silica Whispering-Gallery Mode Resonators

Science.gov (United States)

Anderson, Mark S.

2013-01-01

The motivation of this work was to have robust spectroscopic sensors for sensitive detection and chemical analysis of organic and molecular compounds. The solution is to use silica sphere optical resonators to provide surface-enhanced spectroscopic signal. Whispering-gallery mode (WGM) resonators made from silica microspheres were used for surface-enhanced Raman scattering (SERS) without coupling to a plasmonic mechanism. Large Raman signal enhancement is observed by exclusively using 5.08-micron silica spheres with 785-nm laser excitation. The advantage of this non-plasmonic approach is that the active substrate is chemically inert silica, thermally stable, and relatively simple to fabricate. The Raman signal enhancement is broadly applicable to a wide range of molecular functional groups including aliphatic hydrocarbons, siloxanes, and esters. Applications include trace organic analysis, particularly for in situ planetary instruments that require robust sensors with consistent response.

Reduced chemical warfare agent sorption in polyurethane-painted surfaces via plasma-enhanced chemical vapor deposition of perfluoroalkanes.

Science.gov (United States)

Gordon, Wesley O; Peterson, Gregory W; Durke, Erin M

2015-04-01

Perfluoralkalation via plasma chemical vapor deposition has been used to improve hydrophobicity of surfaces. We have investigated this technique to improve the resistance of commercial polyurethane coatings to chemicals, such as chemical warfare agents. The reported results indicate the surface treatment minimizes the spread of agent droplets and the sorption of agent into the coating. The improvement in resistance is likely due to reduction of the coating's surface free energy via fluorine incorporation, but may also have contributing effects from surface morphology changes. The data indicates that plasma-based surface modifications may have utility in improving chemical resistance of commercial coatings.

Carbon nanosheets by microwave plasma enhanced chemical vapor deposition in CH4-Ar system

International Nuclear Information System (INIS)

Wang Zhipeng; Shoji, Mao; Ogata, Hironori

2011-01-01

We employ a new gas mixture of CH 4 -Ar to fabricate carbon nanosheets by microwave plasma enhanced chemical vapor deposition at the growth temperature of less than 500 deg. C. The catalyst-free nanosheets possess flower-like structures with a large amount of sharp edges, which consist of a few layers of graphene sheets according to the observation by transmission electron microscopy. These high-quality carbon nanosheets demonstrated a faster electron transfer between the electrolyte and the nanosheet surface, due to their edge defects and graphene structures.

The Performance Improvement of N2 Plasma Treatment on ZrO2 Gate Dielectric Thin-Film Transistors with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition IGZO Channel.

Science.gov (United States)

Wu, Chien-Hung; Huang, Bo-Wen; Chang, Kow-Ming; Wang, Shui-Jinn; Lin, Jian-Hong; Hsu, Jui-Mei

2016-06-01

The aim of this paper is to illustrate the N2 plasma treatment for high-κ ZrO2 gate dielectric stack (30 nm) with indium-gallium-zinc-oxide (IGZO) thin-film transistors (TFTs). Experimental results reveal that a suitable incorporation of nitrogen atoms could enhance the device performance by eliminating the oxygen vacancies and provide an amorphous surface with better surface roughness. With N2 plasma treated ZrO2 gate, IGZO channel is fabricated by atmospheric pressure plasma-enhanced chemical vapor deposition (AP-PECVD) technique. The best performance of the AP-PECVD IGZO TFTs are obtained with 20 W-90 sec N2 plasma treatment with field-effect mobility (μ(FET)) of 22.5 cm2/V-s, subthreshold swing (SS) of 155 mV/dec, and on/off current ratio (I(on)/I(off)) of 1.49 x 10(7).

Sensing performance of plasma-enhanced chemical vapor deposition SiC-SiO2-SiC horizontal slot waveguides

NARCIS (Netherlands)

Pandraud, G.; Margallo-Balbas, E.; Sarro, P.M.

2012-01-01

We have studied, for the first time, the sensing capabilities of plasma-enhanced chemical vapor deposition (PECVD) SiC-SiO2-SiC horizontal slot waveguides. Optical propagation losses were measured to be 23.9 dB?cm for the quasi-transverse magnetic mode. To assess the potential of this device as a

Plasma diagnostics and device properties of AlGaN/GaN HEMT passivated with SiN deposited by plasma-enhanced chemical vapour deposition

Energy Technology Data Exchange (ETDEWEB)

Romero, M F; Sanz, M M; Munoz, E [ISOM-Universidad Politecnica de Madrid (UPM). ETSIT, Madrid (Spain); Tanarro, I [Instituto de Estructura de la Materia, CSIC, Madrid (Spain); Jimenez, A, E-mail: itanarro@iem.cfmac.csic.e [Departamento Electronica, Escuela Politecnica Superior, Universidad de Alcala, Alcala de Henares, Madrid (Spain)

2010-12-15

In this work, silicon nitride thin films have been deposited by plasma enhanced chemical vapour deposition on both silicon samples and AlGaN/GaN high electron mobility transistors (HEMT) grown on sapphire substrates. Commercial parallel-plate RF plasma equipment has been used. During depositions, the dissociation rates of SiH{sub 4} and NH{sub 3} precursors and the formation of H{sub 2} and N{sub 2} have been analysed by mass spectrometry as a function of the NH{sub 3}/SiH{sub 4} flow ratio and the RF power applied to the plasma reactor. Afterwards, the properties of the films and the HEMT electrical characteristics have been studied. Plasma composition has been correlated with the SiN deposition rate, refractive index, H content and the final electric characteristics of the passivated transistors.

Josephson plasma resonance in superconducting multilayers

DEFF Research Database (Denmark)

Pedersen, Niels Falsig

1999-01-01

We derive an analytical solution for the josephson plasma resonance of superconducting multilayers. This analytical solution is derived mainly for low T-c systems with magnetic coupling between the superconducting layers, but many features of our results are more general, and thus an application...... to the recently derived plasma resonance phenomena for high T-c superconductors of the BSCCO type is discussed....

Quantitative detection of plasma-generated radicals in liquids by electron paramagnetic resonance spectroscopy

International Nuclear Information System (INIS)

Tresp, H; Hammer, M U; Winter, J; Reuter, S; Weltmann, K-D

2013-01-01

In this paper the qualitative and quantitative detection of oxygen radicals in liquids after plasma treatment with an atmospheric pressure argon plasma jet by electron paramagnetic resonance spectroscopy is investigated. Absolute values for · OH and O 2 ·- radical concentration and their net production rate in plasma-treated liquids are determined without the use of additional scavenging chemicals such as superoxide dismutase (SOD) or mannitol (D-MAN). The main oxygen-centred radical generation in PBS was found to originate from the superoxide radical. It is shown that hidden parameters such as the manufacturer of chemical components could have a big influence on the comparability and reproducibility of the results. Finally, the effect of a shielding gas device for the investigated plasma jet with a shielding gas composition of varying oxygen-to-nitrogen ratio on radical generation after plasma treatment of phosphate-buffered saline solution was investigated. (paper)

Characteristics of Ge-Sb-Te films prepared by cyclic pulsed plasma-enhanced chemical vapor deposition.

Science.gov (United States)

Suk, Kyung-Suk; Jung, Ha-Na; Woo, Hee-Gweon; Park, Don-Hee; Kim, Do-Heyoung

2010-05-01

Ge-Sb-Te (GST) thin films were deposited on TiN, SiO2, and Si substrates by cyclic-pulsed plasma-enhanced chemical vapor deposition (PECVD) using Ge{N(CH3)(C2H5)}, Sb(C3H7)3, Te(C3H7)3 as precursors in a vertical flow reactor. Plasma activated H2 was used as the reducing agent. The growth behavior was strongly dependent on the type of substrate. GST grew as a continuous film on TiN regardless of the substrate temperature. However, GST formed only small crystalline aggregates on Si and SiO2 substrates, not a continuous film, at substrate temperatures > or = 200 degrees C. The effects of the deposition temperature on the surface morphology, roughness, resistivity, crystallinity, and composition of the GST films were examined.

Effect of oxygen plasma on field emission characteristics of single-wall carbon nanotubes grown by plasma enhanced chemical vapour deposition system

Energy Technology Data Exchange (ETDEWEB)

Kumar, Avshish; Parveen, Shama; Husain, Samina; Ali, Javid; Zulfequar, Mohammad [Department of Physics, Jamia Millia Islamia (A Central University), New Delhi 110025 (India); Harsh [Centre for Nanoscience and Nanotechnology, Jamia Millia Islamia, New Delhi 110025 (India); Husain, Mushahid, E-mail: mush-reslab@rediffmail.com [Department of Physics, Jamia Millia Islamia (A Central University), New Delhi 110025 (India); Centre for Nanoscience and Nanotechnology, Jamia Millia Islamia, New Delhi 110025 (India)

2014-02-28

Field emission properties of single wall carbon nanotubes (SWCNTs) grown on iron catalyst film by plasma enhanced chemical vapour deposition system were studied in diode configuration. The results were analysed in the framework of Fowler-Nordheim theory. The grown SWCNTs were found to be excellent field emitters, having emission current density higher than 20 mA/cm{sup 2} at a turn-on field of 1.3 V/μm. The as grown SWCNTs were further treated with Oxygen (O{sub 2}) plasma for 5 min and again field emission characteristics were measured. The O{sub 2} plasma treated SWCNTs have shown dramatic improvement in their field emission properties with emission current density of 111 mA/cm{sup 2} at a much lower turn on field of 0.8 V/μm. The as grown as well as plasma treated SWCNTs were also characterized by various techniques, such as scanning electron microscopy, high resolution transmission electron microscopy, Raman spectroscopy, and Fourier transform infrared spectroscopy before and after O{sub 2} plasma treatment and the findings are being reported in this paper.

The numerical simulation of plasma flow in cylindrical resonant cavity of microwave plasma thruster

International Nuclear Information System (INIS)

Tang, J.-L.; He, H.-Q; Mao, G.-W.

2004-01-01

Microwave Plasma Thruster (MPT) is an electro-thermal propulsive device. MPT consists of microwave generator, gas storing and supplying system, resonant cavity and accelerative nozzle. It generates free-floating plasma brought by the microwave discharge breakdown gas in the resonant cavity, and the plasma exhausted from nozzle produces thrust. MPT has prospective application in spacecraft because of its advantages of high thrust, moderate specific impulse and high efficiency. In this paper, the numerical simulation of the coupling flow field of microwave plasma in resonant cavity under different frequencies will be discussed. The results of numerical simulation are as follows: 1) When the resonant model TM 011 was used, the higher the microwave frequency was, the smaller the size of MPT. The distribution of the electromagnetic field in small cavity, however, remain unchanged. 2) When the resonant model was used, the distribution of the temperature, the pressure and the electronic density in the resonant cavity remained unchanged under different resonant frequencies. 3) When the resonant frequency was increased with a fixed pressure distribution in a small cavity, compare to the MPT with lower frequency, the gas flow rate, the microwave power and the nozzle throat diameter of MPT all decreased. 4) The electromagnetic field in the cylindrical resonant cavity for all MPT with different frequencies was disturbed by the plasma formation. The strong disturbance happened in the region close to the plasma. (author)

Electron heating via self-excited plasma series resonance in geometrically symmetric multi-frequency capacitive plasmas

International Nuclear Information System (INIS)

Schüngel, E; Brandt, S; Schulze, J; Donkó, Z; Korolov, I; Derzsi, A

2015-01-01

The self-excitation of plasma series resonance (PSR) oscillations plays an important role in the electron heating dynamics in capacitively coupled radio-frequency (CCRF) plasmas. In a combined approach of PIC/MCC simulations and a theoretical model based on an equivalent circuit, we investigate the self-excitation of PSR oscillations and their effect on the electron heating in geometrically symmetric CCRF plasmas driven by multiple consecutive harmonics. The discharge symmetry is controlled via the electrical asymmetry effect (EAE), i.e. by varying the total number of harmonics and tuning the phase shifts between them. It is demonstrated that PSR oscillations will be self-excited under both symmetric and asymmetric conditions, if (i) the charge–voltage relation of the plasma sheaths deviates from a simple quadratic behavior and (ii) the inductance of the plasma bulk exhibits a temporal modulation. These two effects have been neglected up to now, but we show that they must be included in the model in order to properly describe the nonlinear series resonance circuit and reproduce the self-excitation of PSR oscillations, which are observed in the electron current density resulting from simulations of geometrically symmetric CCRF plasmas. Furthermore, the effect of PSR self-excitation on the discharge current and the plasma properties, such as the potential profile, is illustrated by applying Fourier analysis. High-frequency oscillations in the entire spectrum between the applied frequencies and the local electron plasma frequency are observed. As a consequence, the electron heating is strongly enhanced by the presence of PSR oscillations. A complex electron heating dynamics is found during the expansion phase of the sheath, which is fully collapsed, when the PSR is initially self-excited. The nonlinear electron resonance heating (NERH) associated with the PSR oscillations causes a spatial asymmetry in the electron heating. By discussing the resulting ionization

Longitudinally mounted light emitting plasma in a dielectric resonator

Energy Technology Data Exchange (ETDEWEB)

Gilliard, Richard; DeVincentis, Marc; Hafidi, Abdeslam; O' Hare, Daniel; Hollingsworth, Gregg [LUXIM Corporation, 1171 Borregas Avenue, Sunnyvale, CA 94089 (United States)

2011-06-08

Methods for coupling power from a dielectric resonator to a light-emitting plasma have been previously described (Gilliard et al IEEE Trans. Plasma Sci. at press). Inevitably, regardless of the efficiency of power transfer, much of the emitted light is absorbed in the resonator itself which physically surrounds much if not all of the radiating material. An investigation into a method is presented here for efficiently coupling power to a longitudinally mounted plasma vessel which is mounted on the surface of the dielectric material of the resonator, thereby eliminating significant absorption of light within the resonator structure. The topology of the resonator and its physical properties as well as those of the metal halide plasma are presented. Results of basic models of the field configuration and plasma are shown as well as a configuration suitable as a practical light source.

Modeling of Sheath Ion-Molecule Reactions in Plasma Enhanced Chemical Vapor Deposition of Carbon Nanotubes

Science.gov (United States)

Hash, David B.; Govindan, T. R.; Meyyappan, M.

2004-01-01

In many plasma simulations, ion-molecule reactions are modeled using ion energy independent reaction rate coefficients that are taken from low temperature selected-ion flow tube experiments. Only exothermic or nearly thermoneutral reactions are considered. This is appropriate for plasma applications such as high-density plasma sources in which sheaths are collisionless and ion temperatures 111 the bulk p!asma do not deviate significantly from the gas temperature. However, for applications at high pressure and large sheath voltages, this assumption does not hold as the sheaths are collisional and ions gain significant energy in the sheaths from Joule heating. Ion temperatures and thus reaction rates vary significantly across the discharge, and endothermic reactions become important in the sheaths. One such application is plasma enhanced chemical vapor deposition of carbon nanotubes in which dc discharges are struck at pressures between 1-20 Torr with applied voltages in the range of 500-700 V. The present work investigates The importance of the inclusion of ion energy dependent ion-molecule reaction rates and the role of collision induced dissociation in generating radicals from the feedstock used in carbon nanotube growth.

Electron waves and resonances in bounded plasmas

CERN Document Server

Vandenplas, Paul E

1968-01-01

General theoretical methods and experimental techniques ; the uniform plasma slab-condenser system ; the hollow cylindrical plasma ; scattering of a plane electromagnetic wave by a plasma column in steady magnetic fields (cold plasma approximation) ; hot non-uniform plasma column ; metallic and dielectric resonance probes, plasma-dielectric coated antenna, general considerations.

Resonance absorption of ICRF wave in edge plasma

International Nuclear Information System (INIS)

Sugihara, Ryo; Yamanaka, Kaoru.

1987-07-01

An edge plasma is shown to significantly absorb ICRF wave when a resonant triplet, a cutoff-resonance-cutoff triplet, is constructed in the evanescent region. Two-ion-component plasmas in a torus are considered though the plasmas are modeled by a slab in which the density changes linearly along the x-axis. The resonance is a perpendicular-ion-cyclotron resonance, i.e., an Alfven resonance, and is formed when the applied frequency ω is smaller than the local cyclotron frequency, at the edge of the antenna side, of the lighter species of ions. Roughly the absorption rate A b is given by M 2 for M 2 >> S 2 and S 4 for S 2 >> M 2 where M = k y l and S ≅ k z l and l is a scale length of the order of the plasma minor radius and k y and k z are the perpendicular and the parallel components of the wave vector. It is noted that the both quantities, M and S, readily become of the order of unity. Since A b is not very sensitive to the density ratio of the two ion species, a few percent of impurities may cause a significant absorption. As the mass ratio of the two ion species comes close to unity the triplet forms readily. Therefore a D-T plasma seems to suffer more easily this kind of resonance absorption than a D-H plasma. (author)

Cesium-plasma-conductivity enhancement in the advanced thermionic energy converter. Final report

International Nuclear Information System (INIS)

Manikopoulos, C.N.

Two methods of plasma conductivity enhancement in a cesium vapor thermionic energy converter have been studied. The first involved resonance photoabsorption of several cesium lines and the second utilized cesium plasma sustenance by application of microwave power. An extensive study of ionization processes in a cesium discharge in the presence of resonance ionization was made. Calculations were made of expected percentage excitation levels for several cesium resonance transitions for different values of neutral density and temperature as well as incident radiation power levels. The results of some of these computations were tabulated. Several ionization schemes were considered. A number of cesium transitions were investigated in the range of 799 to 870 nanometers for four different cesium reservoir temperatures, 467, 511, 550 and 591 K. The related absorption coefficients of the radiation lines in the plasma were deduced and tabulated. The resulting plasma conductivity increase was recorded and the associated ionization enhancement was deduced. A microwave cavity was built where the emitter and collector of a simple thermionic converter made up two of the cavity walls and resonant microwave power was externally applied. The I-V characteristics of the thermionic converter were studied under several microwave power levels in the range of 0 to 2 watts. Significant shifts to higher currents were observed as the microwave power levels were raised. In conclusion, both methods show promise as auxiliary ionization mechanisms for the thermionic energy converter, especially at low emitter temperatures

Resonant magnetohydrodynamic waves in high-beta plasmas

International Nuclear Information System (INIS)

Ruderman, M. S.

2009-01-01

When a global magnetohydrodynamic (MHD) wave propagates in a weakly dissipative inhomogeneous plasma, the resonant interaction of this wave with either local Alfven or slow MHD waves is possible. This interaction occurs at the resonant position where the phase velocity of the global wave coincides with the phase velocity of either Alfven or slow MHD waves. As a result of this interaction a dissipative layer embracing the resonant position is formed, its thickness being proportional to R -1/3 , where R>>1 is the Reynolds number. The wave motion in the resonant layer is characterized by large amplitudes and large gradients. The presence of large gradients causes strong dissipation of the global wave even in very weakly dissipative plasmas. Very often the global wave motion is characterized by the presence of both Alfven and slow resonances. In plasmas with small or moderate plasma beta β, the resonance positions corresponding to the Alfven and slow resonances are well separated, so that the wave motion in the Alfven and slow dissipative layers embracing the Alfven and slow resonant positions, respectively, can be studied separately. However, when β > or approx. R 1/3 , the two resonance positions are so close that the two dissipative layers overlap. In this case, instead of two dissipative layers, there is one mixed Alfven-slow dissipative layer. In this paper the wave motion in such a mixed dissipative layer is studied. It is shown that this motion is a linear superposition of two motions, one corresponding to the Alfven and the other to the slow dissipative layer. The jump of normal velocity across the mixed dissipative layer related to the energy dissipation rate is equal to the sum of two jumps, one that occurs across the Alfven dissipative layer and the other across the slow dissipative layer.

Resonance-enhanced electron-impact excitation of Cu-like gold

Science.gov (United States)

Xia, L.; Zhang, C. Y.; Si, R.; Guo, X. L.; Chen, Z. B.; Yan, J.; Li, S.; Chen, C. Y.; Wang, K.

2017-09-01

Employing the independent-process and isolated-resonance approximations using distorted-waves (IPIRDW), we have performed a series of calculations of the resonance-enhanced electron-impact excitations (EIE) among 27 singly excited levels from the n ≤ 6 configurations of Cu-like gold (Au, Z = 79). Resonance excitation (RE) contributions from both the n = 4 → 4 - 7 and n = 3 → 4 core excitations have been considered. Our results demonstrate that RE contributions are significant and enhance the effective collision strengths (ϒ) of certain excitations by up to an order of magnitude at low temperature (106.1 K), and are still important at relatively high temperature (107.5 K). Results from test calculations of the resonance-enhanced EIE processes among 16 levels from the n ≤ 5 configurations using both the Dirac R-matrix (DRM) and IPIRDW approaches agree very well with each other. This means that the close-coupling effects are not important for this ion, and thus warrants the reliability of present resonance-enhanced EIE data among the 27 levels. The results from the collisional-radiative model (CRM) show that, at 3000 eV, near where Cu-like Au is most abundant, RE contributions have important effects (up to 25%) on the density diagnostic line intensity ratios, which are sensitive near 1020 cm-3. The present work is the first EIE research including RE contributions for Cu-like Au. Our EIE data are more accurate than previous results due to our consideration of RE contributions, and the data should be helpful for modeling and diagnosing a variety of plasmas.

Resonant enhancement in leptogenesis

Science.gov (United States)

Dev, P. S. B.; Garny, M.; Klaric, J.; Millington, P.; Teresi, D.

2018-02-01

Vanilla leptogenesis within the type I seesaw framework requires the mass scale of the right-handed neutrinos to be above 109 GeV. This lower bound can be avoided if at least two of the sterile states are almost mass degenerate, which leads to an enhancement of the decay asymmetry. Leptogenesis models that can be tested in current and upcoming experiments often rely on this resonant enhancement, and a systematic and consistent description is therefore necessary for phenomenological applications. In this paper, we give an overview of different methods that have been used to study the saturation of the resonant enhancement when the mass difference becomes comparable to the characteristic width of the Majorana neutrinos. In this limit, coherent flavor transitions start to play a decisive role, and off-diagonal correlations in flavor space have to be taken into account. We compare various formalisms that have been used to describe the resonant regime and discuss under which circumstances the resonant enhancement can be captured by simplified expressions for the CP asymmetry. Finally, we briefly review some of the phenomenological aspects of resonant leptogenesis.

Role of chlorine in the nanocrystalline silicon film formation by rf plasma-enhanced chemical vapor deposition of chlorinated materials

International Nuclear Information System (INIS)

Shirai, Hajime

2004-01-01

We demonstrate the disorder-induced low-temperature crystallization in the nanocrystalline silicon film growth by rf plasma-enhanced chemical vapor deposition of H 2 -diluted SiH 2 Cl 2 and SiCl 4 . The combination of the chemical reactivity of SiCld (d: dangling bond) and SiHCl complexes and the release of the disorder-induced stress near the growing surface tightly correlate with the phase transitionity of SiCld and SiHCl complexes near the growing surface with the aid of atomic hydrogen, which induce higher degree of disorder in the a-Si network. These features are most prominent in the SiCl 4 compared with those of SiH 2 Cl 2 and SiH 4 , which preferentially enhance the nanocrystalline Si formation

Bose-condensation through resonance decay

International Nuclear Information System (INIS)

Ornik, U.; Pluemer, M.; Strottman, D.

1993-04-01

We show that a system described by an equation of state which contains a high number of degrees of freedom (resonances) can create a considerable amount of superfluid (condensed) pions through the decay of short-lived resonances, if baryon number and entropy are large and the dense matter decouples from chemical equilibrium earlier than from thermal equilibrium. The system cools down faster in the presence of a condensate, an effect that may partially compensate the enhancement of the lifetime expected in the case of quark-gluon-plasma formation. (orig.). 3 figs

Dry cleaning of fluorocarbon residues by low-power electron cyclotron resonance hydrogen plasma

CERN Document Server

Lim, S H; Yuh, H K; Yoon Eui Joon; Lee, S I

1988-01-01

A low-power ( 50 W) electron cyclotron resonance hydrogen plasma cleaning process was demonstrated for the removal of fluorocarbon residue layers formed by reactive ion etching of silicon dioxide. The absence of residue layers was confirmed by in-situ reflection high energy electron diffraction and cross-sectional high resolution transmission electron microscopy. The ECR hydrogen plasma cleaning was applied to contact cleaning of a contact string structure, resulting in comparable contact resistance arising during by a conventional contact cleaning procedure. Ion-assisted chemical reaction involving reactive atomic hydrogen species generated in the plasma is attributed for the removal of fluorocarbon residue layers.

The growth of axially modulated p–n GaN nanowires by plasma-enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Wu, Tung-Hsien; Hong, Franklin Chau-Nan

2013-01-01

Due to the n-type characteristics of intrinsic gallium nitride, p-type gallium nitride (GaN) is more difficult to synthesize than n-type gallium nitride in forming the p–n junctions for optoelectronic applications. For the growth of the p-type gallium nitride, magnesium is used as the dopant. The Mg-doped GaN nanowires (NWs) have been synthesized on (111)-oriented n + -silicon substrates by plasma-enhanced chemical vapor deposition. The scanning electron microscope images showed that the GaN NWs were bent at high Mg doping levels, and the transmission electron microscope characterization indicated that single-crystalline GaN NWs grew along < 0001 > orientation. As shown by energy dispersive spectroscopy, the Mg doping levels in GaN NWs increased with increasing partial pressure of magnesium nitride, which was employed as the dopant precursor for p-GaN NW growth. Photoluminescence measurements suggested the presence of both p- and n‐type GaN NWs. Furthermore, the GaN NWs with axial p–n junctions were aligned between either two-Ni or two-Al electrodes by applying alternating current voltages. The current–voltage characteristics have confirmed the formation of axial p–n junctions in GaN nanowires. - Highlights: ► Grow axially modulated GaN nanowires by plasma-enhanced chemical vapor deposition ► Control the Mg concentration of GaN nanowires by tuning Mg 3 N 2 temperature ► Align the GaN nanowires by applying alternating current voltages between electrodes

Model for resonant plasma probe.

Energy Technology Data Exchange (ETDEWEB)

Warne, Larry Kevin; Johnson, William Arthur; Hebner, Gregory Albert; Jorgenson, Roy E.; Coats, Rebecca Sue

2007-04-01

This report constructs simple circuit models for a hairpin shaped resonant plasma probe. Effects of the plasma sheath region surrounding the wires making up the probe are determined. Electromagnetic simulations of the probe are compared to the circuit model results. The perturbing effects of the disc cavity in which the probe operates are also found.

Resonance Ionization Mass Spectrometry (RIMS): applications in spectroscopy and chemical dynamics

International Nuclear Information System (INIS)

Naik, P.D.; Kumar, Awadhesh; Upadhyaya, Hari; Bajaj, P.N.

2009-01-01

Resonance ionization is a photophysical process wherein electromagnetic radiation is used to ionize atoms, molecules, transient species, etc., by exciting them through their quantum states. The number of photons required to ionize depends on the species being investigated and energy of the photon. Once a charged particle is produced, it is easy to detect it with high efficiency. With the advent of narrow band high power pulsed and cw tunable dye lasers, it has blossomed into a powerful spectroscopic and analytical technique, commonly known as resonance ionization spectroscopy (RIS)/resonance enhanced multiphoton ionization (REMPI). The alliance of resonance ionization with mass spectrometry has grown into a still more powerful technique, known as resonance ionization mass spectrometry (RIMS), which has made significant contributions in a variety of frontier areas of research and development, such as spectroscopy, chemical dynamics, analytical chemistry, cluster science, surface science, radiochemistry, nuclear physics, biology, environmental science, material science, etc. In this article, we shall describe the application of resonance ionization mass spectrometry to spectroscopy of uranium and chemical dynamics of polyatomic molecules

Morphologic and Chemical Properties of PMMA/ATH Layers with Enhanced Abrasion Resistance Realised by Cold Plasma Spraying at Atmospheric Pressure

Directory of Open Access Journals (Sweden)

L. Wallenhorst

2018-01-01

Full Text Available This study investigated the morphologic and chemical properties of coatings based on PMMA/ATH powder and deposited by cold plasma spraying on wood and glass. Since the deposition of pure PMMA/ATH powder with air as process gas yielded coatings with insufficient abrasion resistance, two modifications of the basic process were investigated. Previous studies showed that replacing air as process gas with forming gas did not enhance the abrasion resistance, but the addition of a phenol-formaldehyde resin (PF succeeded in stabilising the particle coatings. In this work, results from morphologic and chemical analysis suggested an encasement of the PMMA/ATH particles by plasma-modified PF and thus a fusion of individual particles, explaining the enhanced bonding. Moreover, adhesion tests confirmed an outstanding bonding between the coating and wood as well as glass, which is assumed to result from interactions between the PF’s hydroxyl groups and functional groups on the substrates’ surfaces. Studies on the wettability revealed a hydrophobic character of such coatings, therefore generally indicating a possible application, for example, to reduce water uptake by wooden materials.

Spectroscopic ellipsometry characterization of nano-crystalline diamondfilms prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery

Czech Academy of Sciences Publication Activity Database

Mistrík, J.; Janíček, P.; Taylor, Andrew; Fendrych, František; Fekete, Ladislav; Jäger, Aleš; Nesládek, M.

2014-01-01

Roč. 571, č. 1 (2014), s. 230-237 ISSN 0040-6090 R&D Projects: GA ČR GA13-31783S; GA MŠk(CZ) LM2011026 Grant - others: COST Nano TP(XE) MP0901; OP VK(XE) CZ.1.07/2.3.00/20.0306 Institutional support: RVO:68378271 Keywords : nanocrystalline diamond * thin films * microwave plasma-enhanced chemical vapor deposition * pulsed plasma * low deposition temperature Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.759, year: 2014

Stress hysteresis during thermal cycling of plasma-enhanced chemical vapor deposited silicon oxide films

Science.gov (United States)

Thurn, Jeremy; Cook, Robert F.

2002-02-01

The mechanical response of plasma-enhanced chemical vapor deposited SiO2 to thermal cycling is examined by substrate curvature measurement and depth-sensing indentation. Film properties of deposition stress and stress hysteresis that accompanied thermal cycling are elucidated, as well as modulus, hardness, and coefficient of thermal expansion. Thermal cycling is shown to result in major plastic deformation of the film and a switch from a compressive to a tensile state of stress; both athermal and thermal components of the net stress alter in different ways during cycling. A mechanism of hydrogen incorporation and release from as-deposited silanol groups is proposed that accounts for the change in film properties and state of stress.

Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor

International Nuclear Information System (INIS)

Sulyaeva, Veronica S.; Kosinova, Marina L.; Rumyantsev, Yurii M.; Kuznetsov, Fedor A.; Kesler, Valerii G.; Kirienko, Viktor V.

2014-01-01

Thin BC x N y films have been obtained by plasma enhanced chemical vapor deposition using N-trimethylborazine as a precursor. The films were deposited on Si(100) and fused silica substrates. The grown films were characterized by ellipsometry, Fourier transform infrared spectroscopy, scanning electron microscopy, X-ray energy dispersive spectroscopy, X-ray photoelectron spectroscopy, spectrophotometry, capacitance–voltage and current–voltage measurements. The deposition parameters, such as substrate temperature (373–973 K) and gas phase composition were varied. Low temperature BC x N y films were found to be high optical transparent layers in the range of 300–2000 nm, the transmittance as high as 93% has been achieved. BC x N y layers are dielectrics with dielectric constant k = 2.2–8.9 depending on the synthesis conditions. - Highlights: • Thin BC x N y films have been obtained by plasma enhanced chemical vapor deposition. • N-trimethylborazine was used as a precursor. • Low temperature BC x N y films were found to be high optical transparent layers (93%). • BC x N y layers are dielectrics with dielectric constant k = 2.2–8.9

Plasma potentials and performance of the advanced electron cyclotron resonance ion source

International Nuclear Information System (INIS)

Xie, Z.Q.; Lyneis, C.M.

1994-01-01

The mean plasma potential was measured on the LBL advanced electron cyclotron resonance (AECR) ion source for a variety of conditions. The mean potentials for plasmas of oxygen, argon, and argon mixed with oxygen in the AECR were determined. These plasma potentials are positive with respect to the plasma chamber wall and are on the order of tens of volts. Electrons injected into the plasma by an electron gun or from an aluminum oxide wall coating with a very high secondary electron emission reduce the plasma potential as does gas mixing. A lower plasma potential in the AECR source coincides with enhanced production of high charged state ions indicating longer ion confinement times. The effect of the extra electrons from external injection or wall coatings is to lower the average plasma potential and to increase the n e τ i of the ECR plasma. With sufficient extra electrons, the need for gas mixing can be eliminated or reduced to a lower level, so the source can operate at lower neutral pressures. A reduction of the neutral pressure decreases charge exchange between ions and neutrals and enhances the production of high charge state ions. An aluminum oxide coating results in the lowest plasma potential among the three methods discussed and the best source performance

Towards Enhanced Performance Thin-film Composite Membranes via Surface Plasma Modification

Science.gov (United States)

Reis, Rackel; Dumée, Ludovic F.; Tardy, Blaise L.; Dagastine, Raymond; Orbell, John D.; Schutz, Jürg A.; Duke, Mikel C.

2016-01-01

Advancing the design of thin-film composite membrane surfaces is one of the most promising pathways to deal with treating varying water qualities and increase their long-term stability and permeability. Although plasma technologies have been explored for surface modification of bulk micro and ultrafiltration membrane materials, the modification of thin film composite membranes is yet to be systematically investigated. Here, the performance of commercial thin-film composite desalination membranes has been significantly enhanced by rapid and facile, low pressure, argon plasma activation. Pressure driven water desalination tests showed that at low power density, flux was improved by 22% without compromising salt rejection. Various plasma durations and excitation powers have been systematically evaluated to assess the impact of plasma glow reactions on the physico-chemical properties of these materials associated with permeability. With increasing power density, plasma treatment enhanced the hydrophilicity of the surfaces, where water contact angles decreasing by 70% were strongly correlated with increased negative charge and smooth uniform surface morphology. These results highlight a versatile chemical modification technique for post-treatment of commercial membrane products that provides uniform morphology and chemically altered surface properties. PMID:27363670

Structured nanocarbon on various metal foils by microwave plasma enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Rius, G; Yoshimura, M

2013-01-01

We present a versatile process for the engineering of nanostructures made of crystalline carbon on metal foils. The single step process by microwave plasma-enhance chemical vapor deposition is demonstrated for various substrate materials, such as Ni or Cu. Either carbon nanotubes (CNT) or carbon nanowalls (CNW) are obtained under same growth conditions and without the need of additional catalyst. The use of spacer and insulator implies a certain control over the kind of allotropes that are obtained. High density and large surface area are morphological characteristics of the thus obtained C products. The possibility of application on many metals, and in the alloy composition, on as-delivered commercially available foils indicates that this strategy can be adapted to a bunch of specific applications, while the production of C nanostructures is of remarkable simplicity.

Heteroepitaxial Growth of Germanium-on-Silicon Using Ultrahigh-Vacuum Chemical Vapor Deposition with RF Plasma Enhancement

Science.gov (United States)

Alharthi, Bader; Grant, Joshua M.; Dou, Wei; Grant, Perry C.; Mosleh, Aboozar; Du, Wei; Mortazavi, Mansour; Li, Baohua; Naseem, Hameed; Yu, Shui-Qing

2018-05-01

Germanium (Ge) films have been grown on silicon (Si) substrate by ultrahigh-vacuum chemical vapor deposition with plasma enhancement (PE). Argon plasma was generated using high-power radiofrequency (50 W) to assist in germane decomposition at low temperature. The growth temperature was varied in the low range of 250°C to 450°C to make this growth process compatible with complementary metal-oxide-semiconductor technology. The material and optical properties of the grown Ge films were investigated. The material quality was determined by Raman and x-ray diffraction techniques, revealing growth of crystalline films in the temperature range of 350°C to 450°C. Photoluminescence spectra revealed improved optical quality at growth temperatures of 400°C and 450°C. Furthermore, material quality study using transmission electron microscopy revealed existence of defects in the Ge layer grown at 400°C. Based on the etch pit density, the average threading dislocation density in the Ge layer obtained at this growth temperature was measured to be 4.5 × 108 cm-2. This result was achieved without any material improvement steps such as use of graded buffer or thermal annealing. Comparison between PE and non-plasma-enhanced growth, in the same machine at otherwise the same growth conditions, indicated increased growth rate and improved material and optical qualities for PE growth.

Chemical Sensors Based on Optical Ring Resonators

Science.gov (United States)

Homer, Margie; Manfreda, Allison; Mansour, Kamjou; Lin, Ying; Ksendzov, Alexander

2005-01-01

Chemical sensors based on optical ring resonators are undergoing development. A ring resonator according to this concept is a closed-circuit dielectric optical waveguide. The outermost layer of this waveguide, analogous to the optical cladding layer on an optical fiber, is a made of a polymer that (1) has an index of refraction lower than that of the waveguide core and (2) absorbs chemicals from the surrounding air. The index of refraction of the polymer changes with the concentration of absorbed chemical( s). The resonator is designed to operate with relatively strong evanescent-wave coupling between the outer polymer layer and the electromagnetic field propagating along the waveguide core. By virtue of this coupling, the chemically induced change in index of refraction of the polymer causes a measurable shift in the resonance peaks of the ring. In a prototype that has been used to demonstrate the feasibility of this sensor concept, the ring resonator is a dielectric optical waveguide laid out along a closed path resembling a racetrack (see Figure 1). The prototype was fabricated on a silicon substrate by use of standard techniques of thermal oxidation, chemical vapor deposition, photolithography, etching, and spin coating. The prototype resonator waveguide features an inner cladding of SiO2, a core of SixNy, and a chemical-sensing outer cladding of ethyl cellulose. In addition to the ring Chemical sensors based on optical ring resonators are undergoing development. A ring resonator according to this concept is a closed-circuit dielectric optical waveguide. The outermost layer of this waveguide, analogous to the optical cladding layer on an optical fiber, is a made of a polymer that (1) has an index of refraction lower than that of the waveguide core and (2) absorbs chemicals from the surrounding air. The index of refraction of the polymer changes with the concentration of absorbed chemical( s). The resonator is designed to operate with relatively strong

Resonance Enhanced Multi-photon Spectroscopy of DNA

Science.gov (United States)

Ligare, Marshall Robert

For over 50 years DNA has been studied to better understand its connection to life and evolution. These past experiments have led to our understanding of its structure and function in the biological environment but the interaction of DNA with UV radiation at the molecular level is still not very well understood. Unique mechanisms in nucleobase chromaphores protect us from adverse chemical reactions after UV absorption. Studying these processes can help develop theories for prebiotic chemistry and the possibility of alternative forms of DNA. Using resonance enhanced multi-photon spectroscopic techniques in the gas phase allow for the structure and dynamics of individual nucleobases to be studied in detail. Experiments studying different levels of structure/complexity with relation to their biological function are presented. Resonant IR multiphoton dissociation spectroscopy in conjunction with molecular mechanics and DFT calculations are used to determine gas phase structures of anionic nucleotide clusters. A comparison of the identified structures with known biological function shows how the hydrogen bonding of the nucleotides and their clusters free of solvent create favorable structures for quick incorporation into enzymes such as DNA polymerase. Resonance enhanced multi-photon ionization (REMPI) spectroscopy techniques such as resonant two photon ionization (R2PI) and IR-UV double resonance are used to further elucidate the structure and excited state dynamics of the bare nucleobases thymine and uracil. Both exhibit long lived excited electronic states that have been implicated in DNA photolesions which can ultimately lead to melanoma and carcinoma. Our experimental data in comparison with many quantum chemical calculations suggest a new picture for the dynamics of thymine and uracil in the gas phase. A high probability of UV absorption from a vibrationally hot ground state to the excited electronic state shows that the stability of thymine and uracil comes from

Plasma-chemical processes and systems

International Nuclear Information System (INIS)

Castro B, J.

1987-01-01

The direct applications of plasma technology on chemistry and metallurgy are presented. The physical fundaments of chemically active non-equilibrium plasma, the reaction kinetics, and the physical chemical transformations occuring in the electrical discharges, which are applied in the industry, are analysed. Some plasma chemical systems and processes related to the energy of hydrogen, with the chemical technology and with the metallurgy are described. Emphasis is given to the optimization of the energy effectiveness of these processes to obtain reducers and artificial energetic carriers. (M.C.K.) [pt

Electron cyclotron resonance plasma photos

Energy Technology Data Exchange (ETDEWEB)

Racz, R.; Palinkas, J. [Institute of Nuclear Research (ATOMKI), H-4026 Debrecen, Bem ter 18/c (Hungary); University of Debrecen, H-4010 Debrecen, Egyetem ter 1 (Hungary); Biri, S. [Institute of Nuclear Research (ATOMKI), H-4026 Debrecen, Bem ter 18/c (Hungary)

2010-02-15

In order to observe and study systematically the plasma of electron cyclotron resonance (ECR) ion sources (ECRIS) we made a high number of high-resolution visible light plasma photos and movies in the ATOMKI ECRIS Laboratory. This required building the ECR ion source into an open ECR plasma device, temporarily. An 8MP digital camera was used to record photos of plasmas made from Ne, Ar, and Kr gases and from their mixtures. We studied and recorded the effect of ion source setting parameters (gas pressure, gas composition, magnetic field, and microwave power) to the shape, color, and structure of the plasma. The analysis of the photo series gave us many qualitative and numerous valuable physical information on the nature of ECR plasmas.

Electron cyclotron resonance plasma photos

International Nuclear Information System (INIS)

Racz, R.; Palinkas, J.; Biri, S.

2010-01-01

In order to observe and study systematically the plasma of electron cyclotron resonance (ECR) ion sources (ECRIS) we made a high number of high-resolution visible light plasma photos and movies in the ATOMKI ECRIS Laboratory. This required building the ECR ion source into an open ECR plasma device, temporarily. An 8MP digital camera was used to record photos of plasmas made from Ne, Ar, and Kr gases and from their mixtures. We studied and recorded the effect of ion source setting parameters (gas pressure, gas composition, magnetic field, and microwave power) to the shape, color, and structure of the plasma. The analysis of the photo series gave us many qualitative and numerous valuable physical information on the nature of ECR plasmas.

Phosphorus-doped thin silica films characterized by magic-angle spinning nuclear magnetic resonance spectroscopy

DEFF Research Database (Denmark)

Jacobsen, H.J.; Skibsted, J.; Kristensen, Martin

2001-01-01

Magic-angle spinning nuclear magnetic resonance spectra of 31P and 29Si have been achieved for a thin silica film doped with only 1.8% 31P and deposited by plasma enhanced chemical vapor deposition on a pure silicon wafer. The observation of a symmetric 31P chemical shift tensor is consistent...

Chemical modeling of a high-density inductively-coupled plasma reactor containing silane

NARCIS (Netherlands)

Kovalgin, Alexeij Y.; Boogaard, A.; Brunets, I.; Holleman, J.; Schmitz, Jurriaan

We carried out the modeling of chemical reactions in a silane-containing remote Inductively Coupled Plasma Enhanced Chemical Vapor Deposition (ICPECVD) system, intended for deposition of silicon, silicon oxide, and silicon nitride layers. The required electron densities and Electron Energy

Preparation and structure of porous dielectrics by plasma enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Gates, S. M.; Neumayer, D. A.; Sherwood, M. H.; Grill, A.; Wang, X.; Sankarapandian, M.

2007-01-01

The preparation of ultralow dielectric constant porous silicon, carbon, oxygen, hydrogen alloy dielectrics, called 'pSiCOH', using a production 200 mm plasma enhanced chemical vapor deposition tool and a thermal treatment is reported here. The effect of deposition temperature on the pSiCOH film is examined using Fourier transform infrared (FTIR) spectroscopy, dielectric constant (k), and film shrinkage measurements. For all deposition temperatures, carbon in the final porous film is shown to be predominantly Si-CH 3 species, and lower k is shown to correlate with increased concentration of Si-CH 3 . NMR and FTIR spectroscopies clearly detect the loss of a removable, unstable, hydrocarbon (CH x ) phase during the thermal treatment. Also detected are increased cross-linking of the Si-O skeleton, and concentration changes for three distinct structures of carbon. In the as deposited films, deposition temperature also affects the hydrocarbon (CH x ) content and the presence of C=O and C=C functional groups

Systematic investigation of resonance-induced single-harmonic enhancement in the extreme-ultraviolet range

International Nuclear Information System (INIS)

Ganeev, R. A.; Bom, L. B. Elouga; Kieffer, J.-C.; Ozaki, T.

2007-01-01

We demonstrate the intensity enhancement of single harmonics in high-order harmonic generation from laser plasma. We identified several targets (In, Sn, Sb, Cr, and Mn) that demonstrate resonance-induced enhancement of single harmonic, that are spectrally close to ionic transitions with strong oscillator strengths. We optimized and obtained enhancements of the 13th, 17th, 21st, 29th, and 33rd harmonics from the above targets, by varying the chirp of the 800 nm wavelength femtosecond laser. We also observe harmonic enhancement by using frequency-doubled pump laser (400 nm wavelength). For Mn plasma pumped by the 400 nm wavelength laser, the maximum order of the enhanced harmonic observed was the 17th order (λ=23.5 nm), which corresponds to the highest photon energy (52.9 eV) reported for an enhanced single harmonic

Cold plasmas

International Nuclear Information System (INIS)

Franz, G.

1990-01-01

This textbook discusses the following topics: Phenomenological description of a direct current glow discharge; the plasma (temperature distribution and measurement, potential variation, electron energy distribution function, charge neutralization, wall potentials, plasma oscillations); Production of charge carriers (ions, electrons, ionization in the cathode zone, negative glowing zone, Faraday dark space, positive column, anode zone, hollow cathode discharges); RF-discharges (charge carrier production, RF-Shields, scattering mechanisms); Sputtering (ion-surface interaction, kinetics, sputtering yield and energy distribution, systems and conditions, film formation and stresses, contamination, bias techniques, multicomponent film deposition, cohesion, magnetrons, triode systems, plasma enhanced chemical vapor deposition); Dry etching (sputter etching, reactive etching, topography, process control, quantitative investigations); Etching mechanisms (etching of Si and SiO 2 with CF 4 , of III/V-compound-semiconductors, combination of isotrope and anisotrope etching methods, surface cleaning); ion beam systems (applications, etching); Dyclotron-resonance-systems (electron cyclotron resonance systems, whistler-sources and 'resonant inductive plasma etching'); Appendix (electron energy distribution functions, Bohm's transition zone, plasma oscillations, scattering cross sections and mean free path, metastable states, Child-Langmuir-Schottky equation, loss mechanisms, charge carrier distribution in the positive column, breakdown at high frequencies, motion in a magnetic field, skin depth of an electric field for a HF-discharge, whistler waves, dispersion relations for plane wave propagation). (orig.) With 138 figs

Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor

Energy Technology Data Exchange (ETDEWEB)

Sulyaeva, Veronica S., E-mail: veronica@niic.nsc.ru [Department of Functional Materials Chemistry, Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk 630090 (Russian Federation); Kosinova, Marina L.; Rumyantsev, Yurii M.; Kuznetsov, Fedor A. [Department of Functional Materials Chemistry, Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk 630090 (Russian Federation); Kesler, Valerii G. [Laboratory of Physical Principles for Integrated Microelectronics, Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk 630090 (Russian Federation); Kirienko, Viktor V. [Laboratory of Nonequilibrium Semiconductors Systems, Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk 630090 (Russian Federation)

2014-05-02

Thin BC{sub x}N{sub y} films have been obtained by plasma enhanced chemical vapor deposition using N-trimethylborazine as a precursor. The films were deposited on Si(100) and fused silica substrates. The grown films were characterized by ellipsometry, Fourier transform infrared spectroscopy, scanning electron microscopy, X-ray energy dispersive spectroscopy, X-ray photoelectron spectroscopy, spectrophotometry, capacitance–voltage and current–voltage measurements. The deposition parameters, such as substrate temperature (373–973 K) and gas phase composition were varied. Low temperature BC{sub x}N{sub y} films were found to be high optical transparent layers in the range of 300–2000 nm, the transmittance as high as 93% has been achieved. BC{sub x}N{sub y} layers are dielectrics with dielectric constant k = 2.2–8.9 depending on the synthesis conditions. - Highlights: • Thin BC{sub x}N{sub y} films have been obtained by plasma enhanced chemical vapor deposition. • N-trimethylborazine was used as a precursor. • Low temperature BC{sub x}N{sub y} films were found to be high optical transparent layers (93%). • BC{sub x}N{sub y} layers are dielectrics with dielectric constant k = 2.2–8.9.

Resonant quasiparticles in plasma turbulence

International Nuclear Information System (INIS)

Mendonca, J.T.; Bingham, R.; Shukla, P.K.

2003-01-01

A general view is proposed on wave propagation in fluids and plasmas where the resonant interaction of monochromatic waves with quasiparticles is considered. A kinetic equation for quasiparticles is used to describe the broadband turbulence interacting with monochromatic waves. Resonant interactions occur when the phase velocity of the long wavelength monochromatic wave is nearly equal to the group velocity of short wavelength wave packets, or quasiparticles, associated with the turbulent spectrum. It is shown that quasiparticle Landau damping can take place, as well as quasiparticle beam instabilities, thus establishing a direct link between short and large wavelength perturbations of the medium. This link is distinct from the usual picture of direct and inverse energy cascades, and it can be used as a different paradigm for the fluid and plasma turbulence theories

Doubly excited P-wave resonance states of H− in Debye plasmas

International Nuclear Information System (INIS)

Jiao, L. G.; Ho, Y. K.

2013-01-01

We investigate the doubly excited P-wave resonance states of H − system in Debye plasmas modeled by static screened Coulomb potentials. The screening effects of the plasma environment on resonance parameters (energy and width) are investigated by employing the complex-scaling method with Hylleraas-type wave functions for both the shape and Feshbach resonances associated with the H(N = 2 to 6) thresholds. Under the screening conditions, the H(N) threshold states are no longer l degenerate, and all the H − resonance energy levels are shifted away from their unscreened values toward the continuum. The influence of Debye plasmas on resonance widths has also been investigated. The shape resonance widths are broadened with increasing plasma screening strength, whereas the Feshbach resonance widths would generally decrease. Our results associated with the H(N = 2) and H(N = 3) thresholds are compared with others in the literature

Controlled surface diffusion in plasma-enhanced chemical vapor deposition of GaN nanowires

International Nuclear Information System (INIS)

Hou, W C; Hong, Franklin Chau-Nan

2009-01-01

This study investigates the growth of GaN nanowires by controlling the surface diffusion of Ga species on sapphire in a plasma-enhanced chemical vapor deposition (CVD) system. Under nitrogen-rich growth conditions, Ga has a tendency to adsorb on the substrate surface diffusing to nanowires to contribute to their growth. The significance of surface diffusion on the growth of nanowires is dependent on the environment of the nanowire on the substrate surface as well as the gas phase species and compositions. Under nitrogen-rich growth conditions, the growth rate is strongly dependent on the surface diffusion of gallium, but the addition of 5% hydrogen in nitrogen plasma instantly diminishes the surface diffusion effect. Gallium desorbs easily from the surface by reaction with hydrogen. On the other hand, under gallium-rich growth conditions, nanowire growth is shown to be dominated by the gas phase deposition, with negligible contribution from surface diffusion. This is the first study reporting the inhibition of surface diffusion effects by hydrogen addition, which can be useful in tailoring the growth and characteristics of nanowires. Without any evidence of direct deposition on the nanowire surface, gallium and nitrogen are shown to dissolve into the catalyst for growing the nanowires at 900 deg. C.

Properties and electric characterizations of tetraethyl orthosilicate-based plasma enhanced chemical vapor deposition oxide film deposited at 400 °C for through silicon via application

International Nuclear Information System (INIS)

Su, Meiying; Yu, Daquan; Liu, Yijun; Wan, Lixi; Song, Chongshen; Dai, Fengwei; Xue, Kai; Jing, Xiangmeng; Guidotti, Daniel

2014-01-01

The dielectric via liner of through silicon vias was deposited at 400 °C using a tetraethyl orthosilicate (TEOS)-based plasma enhanced chemical vapor deposition process in a via-middle integration scheme. The morphology, conformality and chemical compositions of the liner film were characterized using field emission scanning electron microscopy and Fourier Transform Infrared spectroscopy. The thermal properties and electrical performance of blanket TEOS films were investigated by high temperature film stress and mercury probe Capacitance–Voltage measurements. The TEOS SiO 2 films show good conformality, excellent densification, low thermal stress, high breakdown voltage and low current leakage. - Highlights: • Tetraethyl orthosilicate-based oxide films were deposited for packaging application. • The oxide films deposited plasma-enhanced chemical vapor deposition (PECVD) at 400 °C. • The PECVD oxide films exhibit good step coverage. • The 400 °C PECVD oxide films exhibit low thermal stress and current leakage. • The 400 °C PECVD oxide films show high breakdown voltage and acceptable permittivity

Properties and electric characterizations of tetraethyl orthosilicate-based plasma enhanced chemical vapor deposition oxide film deposited at 400 °C for through silicon via application

Energy Technology Data Exchange (ETDEWEB)

Su, Meiying, E-mail: sumeiying@ime.ac.cn [Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029 (China); National Center for Advanced Packaging, Wuxi 214135 (China); Yu, Daquan, E-mail: yudaquan@ime.ac.cn [Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029 (China); National Center for Advanced Packaging, Wuxi 214135 (China); Jiangsu R and D Center for Internet of Things, Wuxi 214135 (China); Liu, Yijun [Piotech Co. Ltd, Shenyang 110179 (China); Wan, Lixi [Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029 (China); Song, Chongshen; Dai, Fengwei [Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029 (China); National Center for Advanced Packaging, Wuxi 214135 (China); Xue, Kai [National Center for Advanced Packaging, Wuxi 214135 (China); Jing, Xiangmeng [Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029 (China); National Center for Advanced Packaging, Wuxi 214135 (China); Guidotti, Daniel [Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029 (China)

2014-01-01

The dielectric via liner of through silicon vias was deposited at 400 °C using a tetraethyl orthosilicate (TEOS)-based plasma enhanced chemical vapor deposition process in a via-middle integration scheme. The morphology, conformality and chemical compositions of the liner film were characterized using field emission scanning electron microscopy and Fourier Transform Infrared spectroscopy. The thermal properties and electrical performance of blanket TEOS films were investigated by high temperature film stress and mercury probe Capacitance–Voltage measurements. The TEOS SiO{sub 2} films show good conformality, excellent densification, low thermal stress, high breakdown voltage and low current leakage. - Highlights: • Tetraethyl orthosilicate-based oxide films were deposited for packaging application. • The oxide films deposited plasma-enhanced chemical vapor deposition (PECVD) at 400 °C. • The PECVD oxide films exhibit good step coverage. • The 400 °C PECVD oxide films exhibit low thermal stress and current leakage. • The 400 °C PECVD oxide films show high breakdown voltage and acceptable permittivity.

Nanostructure and optical properties of CeO{sub 2} thin films obtained by plasma-enhanced chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Barreca, D.; Bruno, G.; Gasparotto, A.; Losurdo, M.; Tondello, E

2003-12-15

In the present study, Spectroscopic Ellipsometry (SE) is used to investigate the interrelations between nanostructure and optical properties of CeO{sub 2} thin films deposited by Plasma-Enhanced Chemical Vapor Deposition (PE-CVD). The layers were synthesized in Ar and Ar-O{sub 2} plasmas on Si(100) substrates at temperatures lower than 300 deg. C. Both the real and imaginary parts of the complex dielectric functions and, subsequently, the optical constants of the films are derived up to 6.0 eV photon energy. Particular attention is devoted to the influence of synthesis conditions and sample properties on the optical response, taking into account the effects of surface roughness and SiO{sub 2} interface layer on Si.

Resonant third-harmonic generation of a short-pulse laser from electron-hole plasmas

Energy Technology Data Exchange (ETDEWEB)

Kant, Niti [Department of Physics, Lovely Professional University, Phagwara, Punjab 144 402 (India); Nandan Gupta, Devki [Department of Physics and Astrophysics, University of Delhi, Delhi 110 007 (India); Suk, Hyyong [Advanced Photonics Research Institute (APRI) and Graduate Program of Photonics and Applied Physics, Gwangju Institute of Science and Technology, Gwangju 500 712 (Korea, Republic of)

2012-01-15

In semiconductors, free carriers are created in pairs in inter-band transitions and consist of an electron and its corresponding hole. At very high carrier densities, carrier-carrier collisions dominate over carrier-lattice collisions and carriers begin to behave collectively to form plasma. Here, we apply a short-pulse laser to generate third-harmonic radiation from a semiconductor plasma (electron-hole plasma) in the presence of a transverse wiggler magnetic-field. The process of third-harmonic generation of an intense short-pulse laser is resonantly enhanced by the magnetic wiggler, i.e., wiggler magnetic field provides the necessary momentum to third-harmonic photons. In addition, a high-power laser radiation, propagating through a semiconductor imparts an oscillatory velocity to the electrons and exerts a ponderomotive force on electrons at the third-harmonic frequency of the laser. This oscillatory velocity produces a third-harmonic longitudinal current. And due to the beating of the longitudinal electron velocity and the wiggler magnetic field, a transverse third-harmonic current is produced that drives third-harmonic electromagnetic radiation. It is finally observed that for a specific wiggler wave number value, the phase-matching conditions for the process are satisfied, leading to resonant enhancement in the energy conversion efficiency.

Resonant third-harmonic generation of a short-pulse laser from electron-hole plasmas

International Nuclear Information System (INIS)

Kant, Niti; Nandan Gupta, Devki; Suk, Hyyong

2012-01-01

In semiconductors, free carriers are created in pairs in inter-band transitions and consist of an electron and its corresponding hole. At very high carrier densities, carrier-carrier collisions dominate over carrier-lattice collisions and carriers begin to behave collectively to form plasma. Here, we apply a short-pulse laser to generate third-harmonic radiation from a semiconductor plasma (electron-hole plasma) in the presence of a transverse wiggler magnetic-field. The process of third-harmonic generation of an intense short-pulse laser is resonantly enhanced by the magnetic wiggler, i.e., wiggler magnetic field provides the necessary momentum to third-harmonic photons. In addition, a high-power laser radiation, propagating through a semiconductor imparts an oscillatory velocity to the electrons and exerts a ponderomotive force on electrons at the third-harmonic frequency of the laser. This oscillatory velocity produces a third-harmonic longitudinal current. And due to the beating of the longitudinal electron velocity and the wiggler magnetic field, a transverse third-harmonic current is produced that drives third-harmonic electromagnetic radiation. It is finally observed that for a specific wiggler wave number value, the phase-matching conditions for the process are satisfied, leading to resonant enhancement in the energy conversion efficiency.

Resonances and surface waves in bounded plasmas

International Nuclear Information System (INIS)

Bowers, K.J.; Qui, D.W.; Smith, H.B.; Birdsall, C.K.

1999-01-01

Surface waves provide a promising means of creating large, area plasmas. These waves can uniformly distribute the excitation energy and while presenting a small resistance and zero reactance to the driving source. Experimentally and in the simulations, the electron temperature is low (like 1--3 eV) as is the plasma potential (like 10 Te). The use of surface waves experimentally, and now industrially, to sustain large area plasma sources with device size is comparable to free space wavelength have motivated the authors to refine the theories of [1] and [2] to be fully electromagnetic. The wave dispersion predicted by the electromagnetic theory differs from the predictions of the prior theories and the results illuminate limitations of the electrostatic model. The use of surface waves have also motivated them to explore the mechanisms by which surface waves heat the plasma. In the 1d electrostatic simulations high velocity electron bunches are formed in the sheaths and are alternatively accelerated from each sheath into the bulk plasma each RF cycle. They speculate similar mechanisms provide the ionization in surface wave discharges. They also see in these simulations the plasma makes an abrupt transition from capacitively coupled to resistively coupled and the series resonance locks onto the drive frequency; these abrupt transitions resemble mode-jumping seen experimentally in large area sources. Furthermore, the density profile of the plasma tracks the drive frequency while in the resonant mode giving a new mechanism by which the plasma parameters can be controlled. They are currently investigating the effect of the driving electrode shape has on these resonances and conducting 2d simulations of a large area surface wave source to explore the ignition of surface wave devices and how the plasma fills in the device

Spectrum of resonant plasma oscillations in long Josephson junctions

International Nuclear Information System (INIS)

Holst, T.

1996-01-01

An analysis is presented for the amplitude of the plasma oscillations in the zero-voltage state of a long and narrow Josephson tunnel junction. The calculation is valid for arbitrary normalized junction length and arbitrary bias current. The spectrum of the plasma resonance is found numerically as solutions to an analytical equation. The low-frequency part of the spectrum contains a single resonance, which is known to exist also in the limit of a short and narrow junction. Above a certain cutoff frequency, a series of high-frequency standing wave plasma resonances is excited, a special feature of long Josephson junctions. copyright 1996 The American Physical Society

Structural and photoluminescence investigation on the hot-wire assisted plasma enhanced chemical vapor deposition growth silicon nanowires

International Nuclear Information System (INIS)

Chong, Su Kong; Goh, Boon Tong; Wong, Yuen-Yee; Nguyen, Hong-Quan; Do, Hien; Ahmad, Ishaq; Aspanut, Zarina; Muhamad, Muhamad Rasat; Dee, Chang Fu; Rahman, Saadah Abdul

2012-01-01

High density of silicon nanowires (SiNWs) were synthesized by a hot-wire assisted plasma enhanced chemical vapor deposition technique. The structural and optical properties of the as-grown SiNWs prepared at different rf power of 40 and 80 W were analyzed in this study. The SiNWs prepared at rf power of 40 W exhibited highly crystalline structure with a high crystal volume fraction, X C of ∼82% and are surrounded by a thin layer of SiO x . The NWs show high absorption in the high energy region (E>1.8 eV) and strong photoluminescence at 1.73 to 2.05 eV (red–orange region) with a weak shoulder at 1.65 to 1.73 eV (near IR region). An increase in rf power to 80 W reduced the X C to ∼65% and led to the formation of nanocrystalline Si structures with a crystallite size of <4 nm within the SiNWs. These NWs are covered by a mixture of uncatalyzed amorphous Si layer. The SiNWs prepared at 80 W exhibited a high optical absorption ability above 99% in the broadband range between 220 and ∼1500 nm and red emission between 1.65 and 1.95 eV. The interesting light absorption and photoluminescence properties from both SiNWs are discussed in the text. - Highlights: ► Growth of random oriented silicon nanowires using hot-wire assisted plasma enhanced chemical vapor deposition. ► Increase in rf power reduces the crystallinity of silicon nanowires. ► High density and nanocrystalline structure in silicon nanowires significant enhance the near IR light absorption. ► Oxide defects and silicon nanocrystallites in silicon nanowires reveal photoluminescence in red–orange and red regions.

Stress hysteresis and mechanical properties of plasma-enhanced chemical vapor deposited dielectric films

Science.gov (United States)

Thurn, Jeremy; Cook, Robert F.; Kamarajugadda, Mallika; Bozeman, Steven P.; Stearns, Laura C.

2004-02-01

A comprehensive survey is described of the responses of three plasma-enhanced chemical vapor deposited dielectric film systems to thermal cycling and indentation contact. All three films—silicon oxide, silicon nitride, and silicon oxy-nitride—exhibited significant nonequilibrium permanent changes in film stress on thermal cycling or annealing. The linear relationship between stress and temperature changed after the films were annealed at 300 °C, representing a structural alteration in the film reflecting a change in coefficient of thermal expansion or biaxial modulus. A double-substrate method was used to deduce both thermoelastic properties before and after the anneal of selected films and the results were compared with the modulus deconvoluted from small-scale depth-sensing indentation experiments (nanoindentation). Rutherford backscattering spectrometry and hydrogen forward scattering were used to deduce the composition of the films and it was found that all the films contained significant amounts of hydrogen.

Plasma-enhanced chemical vapor deposition of graphene on copper substrates

Directory of Open Access Journals (Sweden)

Nicolas Woehrl

2014-04-01

Full Text Available A plasma enhanced vapor deposition process is used to synthesize graphene from a hydrogen/methane gas mixture on copper samples. The graphene samples were transferred onto SiO2 substrates and characterized by Raman spectroscopic mapping and atomic force microscope topographical mapping. Analysis of the Raman bands shows that the deposited graphene is clearly SLG and that the sheets are deposited on large areas of several mm2. The defect density in the graphene sheets is calculated using Raman measurements and the influence of the process pressure on the defect density is measured. Furthermore the origin of these defects is discussed with respect to the process parameters and hence the plasma environment.

Effect of self-focusing on resonant third harmonic generation of laser in a rippled density plasma

International Nuclear Information System (INIS)

Kaur, Sukhdeep; Sharma, A. K.; Yadav, Sushila

2010-01-01

Resonant third harmonic generation by a Gaussian laser beam in a rippled density plasma is studied. The laser ponderomotive force induces second harmonic longitudinal velocity on electrons that couples with the static density ripple to produce a density perturbation at 2ω,2k+q, where ω and k are the frequency and wave number of the laser and q is the ripple wave number of the laser. This density perturbation beats with electron oscillatory velocity at ω,k-vector to produce a nonlinear current driving the third harmonic generation. In the regime of quadratic nonlinearity, the self-focusing of the laser enhances the third harmonic power. However, at higher intensity, plasma density is significantly reduced on the axis, detuning the third harmonic resonance and weakening the harmonic yield. Self-focusing causes enhancement in the efficiency of harmonic generation.

Atomic resonances in nuclear fusion plasmas

International Nuclear Information System (INIS)

Clauser, C. F.; Barrachina, R. O.

2013-01-01

We present a study of zero energy resonances of photoionization and radiative recombination cross section for the different species in a fusion reactor. In this context, the interaction potential is screened and its typical length depends on the plasma density and temperature. Due to the nature of these resonances, we propose other atomic processes in which they can take place. Finally, we show the density and temperature conditions where these resonances occur and their probable consequence on the reactor performance. (author)

Diamond-like carbon films deposited on polycarbonates by plasma-enhanced chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Guo, C.T. [Department of Computer and Communication, Diwan College of Management, 72141 Taiwan (China)], E-mail: ctguo@dwu.edu.tw

2008-04-30

Diamond-like carbon films were coated on optical polycarbonate using plasma-enhanced chemical vapor deposition. A mixture of SiH{sub 4} and CH{sub 4}/H{sub 2} gases was utilized to reduce the internal compressive stress of the deposited films. The structure of the DLC films was characterized as a function of film thickness using Raman spectroscopy. The dependence of G peak positions and the intensity ratio of I{sub D}/I{sub G} on the DLC film thicknesses was analyzed in detail. Other studies involving atomic force microscopy, ultraviolet visible spectrometry, and three adhesion tests were conducted. Good transparency in the visible region, and good adhesion between diamond-like carbon films and polycarbonate were demonstrated. One-time recordings before and after a DLC film was coated on compact rewritable disc substrates were analyzed as a case study. The results reveal that the diamond-like carbon film overcoating the optical polycarbonates effectively protects the storage media.

Interaction of plasma vortices with resonant particles

DEFF Research Database (Denmark)

Jovanovic, D.; Pécseli, Hans; Juul Rasmussen, J.

1990-01-01

Kinetic effects associated with the electron motion along magnetic field lines in low‐beta plasmas are studied. Using the gyrokinetic description of electrons, a kinetic analog of the reduced magnetohydrodynamic equations is derived, and it is shown that in the strongly nonlinear regime...... particles. The evolution equations indicate the possibility of excitation of plasma vortices by electron beams....... they possess localized solutions in the form of dipolar vortices, which can efficiently interact with resonant electrons. In the adiabatic limit, evolution equations are derived for the vortex parameters, describing exchange of the energy, enstrophy, and of the Poynting vector between the vortex and resonant...

Stochastic resonance is applied to quantitative analysis for weak chromatographic signal of glyburide in plasma

International Nuclear Information System (INIS)

Zhang Wei; Xiang Bingren; Wu Yanwei; Shang Erxin

2005-01-01

Based on the theory of stochastic resonance, a new method carried on the quantitive analysis to weak chromatographic signal of glyburide in plasma, which was embedded in the noise background and the signal-to-noise ratio (SNR) of HPLC-UV is enhanced remarkably. This method enhances the quantification limit to 1 ng ml -1 , which is the same as HPLC-MS, and makes it possible to detect the weak signal accurately by HPLC-UV, which was not suitable before. The results showed good recovery and linear range from 1 to 50 ng ml -1 of glyburide in plasma and the method can be used for quantitative analysis of glyburide

Upper Hybrid Resonance of Microwaves with a Large Magnetized Plasma Sheet

International Nuclear Information System (INIS)

Huo Wenqing; Guo Shijie; Ding Liang; Xu Yuemin

2013-01-01

A large magnetized plasma sheet with size of 60 cm × 60 cm × 2 cm was generated by a linear hollow cathode discharge under the confinement of a uniform magnetic field generated by a Helmholtz Coil. The microwave transmission characteristic of the plasma sheet was measured for different incident frequencies, in cases with the electric field polarization of the incident microwave either perpendicular or parallel to the magnetic field. In this measurement, parameters of the plasma sheet were changed by varying the discharge current and magnetic field intensity. In the experiment, upper hybrid resonance phenomena were observed when the electric field polarization of the incident wave was perpendicular to the magnetic field. These resonance phenomena cannot be found in the case of parallel polarization incidence. This result is consistent with theoretical consideration. According to the resonance condition, the electron density values at the resonance points are calculated under various experimental conditions. This kind of resonance phenomena can be used to develop a specific method to diagnose the electron density of this magnetized plasma sheet apparatus. Moreover, it is pointed out that the operating parameters of the large plasma sheet in practical applications should be selected to keep away from the upper hybrid resonance point to prevent signals from polarization distortion

Electron cyclotron resonance heating assisted plasma startup in the Tore Supra tokamak

International Nuclear Information System (INIS)

Bucalossi, J.; Hertout, P.; Lennholm, M.; Saint-Laurent, F.; Bouquey, F.; Darbos, C.; Traisnel, E.

2009-04-01

ECRH assisted plasma startup at fundamental resonance is investigated in Tore Supra in view of ITER operation. ECRH pre-ionisation is found to be very efficient allowing plasma initiation in a wide range of pre-fill pressure compared to ohmic startup. Reliable assisted startup has been achieved at the ITER reference toroidal electric field (0.3 V/m) with 160 kW of ECRH. Resonance location scan indicates that the plasma is initiated at the resonance location and that the plasma current channel position had to be real-time controlled since the very beginning of the discharge to obtain robust plasma startup. (authors)

Resonant transducers for solid-state plasma density modulation

Energy Technology Data Exchange (ETDEWEB)

Hallock, Gary A., E-mail: hallock@ece.utexas.edu [The University of Texas at Austin, Austin, Texas 78701 (United States); Meier, Mark A., E-mail: mark.a.meier@exxonmobil.com [ExxonMobil Upstream Research Company, Houston, Texas 77389 (United States)

2016-04-15

We have developed transducers capable of modulating the plasma density and plasma density gradients in indium antimonide. These transducers make use of piezoelectric drivers to excite acoustic pressure resonance at 3λ/2, generating large amplitude standing waves and plasma density modulations. The plasma density has been directly measured using a laser diagnostic. A layered media model shows good agreement with the experimental measurements.

Wakefield excitation in plasma resonator by a sequence of relativistic electron bunches

International Nuclear Information System (INIS)

Kiselev, V.A.; Linnik, A.F.; Mirny, V.I.; Onishchenko, I.N.; Uskov, V.V.

2008-01-01

Wakefield excitation in a plasma resonator by a sequence of relativistic electron bunches with the purpose to increase excited field amplitude in comparison to waveguide case is experimentally investigated. A sequence of short electron bunches is produced by the linear resonant accelerator. Plasma resonator is formed at the beam-plasma discharge in rectangular metal waveguide filled with gas and closed by metal foil at entrance and movable short-circuited plunger at exit. Measurements of wakefield amplitude are performed showing considerably higher wakefield amplitude for resonator case

Low-temperature synthesis of diamond films by photoemission-assisted plasma-enhanced chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Kawata, Mayuri, E-mail: kawata@mail.tagen.tohoku.ac.jp; Ojiro, Yoshihiro; Ogawa, Shuichi; Takakuwa, Yuji [Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan); Masuzawa, Tomoaki; Okano, Ken [International Christian University, 3-10-2 Osawa, Mitaka 181-8585 (Japan)

2014-03-15

Photoemission-assisted plasma-enhanced chemical vapor deposition (PA-PECVD), a process in which photoelectrons emitted from a substrate irradiated with ultraviolet light are utilized as a trigger for DC discharge, was investigated in this study; specifically, the DC discharge characteristics of PA-PECVD were examined for an Si substrate deposited in advance through hot-filament chemical vapor deposition with a nitrogen-doped diamond layer of thickness ∼1 μm. Using a commercially available Xe excimer lamp (hν = 7.2 eV) to illuminate the diamond surface with and without hydrogen termination, the photocurrents were found to be 3.17 × 10{sup 12} and 2.11 × 10{sup 11} electrons/cm{sup 2}/s, respectively. The 15-fold increase in photocurrent was ascribed to negative electron affinity (NEA) caused by hydrogen termination on the diamond surfaces. The DC discharge characteristics revealed that a transition bias voltage from a Townsend-to-glow discharge was considerably decreased because of NEA (from 490 to 373 V for H{sub 2} gas and from 330 to 200 V for Ar gas), enabling a reduction in electric power consumption needed to synthesize diamond films through PA-PECVD. In fact, the authors have succeeded in growing high-quality diamond films of area 2.0 cm{sup 2} at 540 °C with a discharge power of only 1.8 W, plasma voltage of 156.4 V, and discharge current of 11.7 mA under the glow discharge of CH{sub 4}/H{sub 2}/Ar mixed gases. In addition to having only negligible amounts of graphite and amorphous carbon, the diamond films exhibit a relatively high diamond growth rate of 0.5 μm/h at temperatures as low as 540 °C, which is attributed to Ar{sup +} ions impinging on the diamond surface, and causing the removal of hydrogen atoms from the surface through sputtering. This process leads to enhanced CH{sub x} radical adsorption, because the sample was applied with a negative potential to accelerate photoelectrons in PA-PECVD.

Synthesis and growth mechanism of Fe-catalyzed carbon nanotubes by plasma-enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Jiang Jun; Feng Tao; Cheng Xinhong; Dai Lijuan; Cao Gongbai; Jiang Bingyao; Wang Xi; Liu Xianghuai; Zou Shichang

2006-01-01

Plasma-enhanced chemical vapor deposition (PECVD) was used to grow Fe-catalyzed carbon nanotubes (CNTs). The nanotubes had a uniform diameter in the range of about 10-20 nm. A base growth mode was responsible for the CNTs growth using a mixture of H 2 (60 sccm) and C 2 H 2 (15 sccm). For a mixture of H 2 (100 sccm) and C 2 H 2 (25 sccm), a complicated growth mechanism took place involving both the base growth and the tip growth. X-ray photoelectron spectroscopy measurements revealed that the grown CNTs contained C-H covalent bonds and Fe-C bonds located at the interface between them and the substrates. The factors determining the growth mechanism of CNTs are discussed and their growth mechanisms with the different gas ratios are suggested

Effect of Ambipolar Plasma Flow on the Penetration of Resonant Magnetic Perturbations in a Quasi-axisymmetric Stellarator

International Nuclear Information System (INIS)

Reiman, A.; Zarnstorff, M.; Mikkelsen, D.; Owen, L.; Mynick, H.; Hudson, S.; Monticello, D.

2005-01-01

A reference equilibrium for the U.S. National Compact Stellarator Experiment is predicted to be sufficiently close to quasi-symmetry to allow the plasma to flow in the toroidal direction with little viscous damping, yet to have sufficiently large deviations from quasi-symmetry that nonambipolarity significantly affects the physics of the shielding of resonant magnetic perturbations by plasma flow. The unperturbed velocity profile is modified by the presence of an ambipolar potential, which produces a broad velocity profile. In the presence of a resonant magnetic field perturbation, nonambipolar transport produces a radial current, and the resulting j x B force resists departures from the ambipolar velocity and enhances the shielding

Study of selective heating at ion cyclotron resonance for the plasma separation process

Science.gov (United States)

Compant La Fontaine, A.; Pashkovsky, V. G.

1995-12-01

The plasma separation process by ion cyclotron resonance heating (ICRH) is studied both theoretically and experimentally on two devices: the first one called ERIC (Ion Cyclotron Resonance Experiment) at Saclay (France) [P. Louvet, Proceedings of the 2nd Workshop on Separation Phenomena in Liquids and Gases, Versailles, France, 1989, edited by P. Louvet, P. Noe, and Soubbaramayer (Centre d'Etudes Nucléaires de Saclay and Cité Scientifique Parcs et Technopoles, Ile de France Sud, France, 1989), Vol. 1, p. 5] and the other one named SIRENA at the Kurchatov Institute, Moscow, Russia [A. I. Karchevskii et al., Plasma Phys. Rep. 19, 214 (1993)]. The radio frequency (RF) transversal magnetic field is measured by a magnetic probe both in plasma and vacuum and its Fourier spectrum versus the axial wave number kz is obtained. These results are in agreement with the electromagnetic (EM) field calculation model based on resolution of Maxwell equations by a time-harmonic scheme studied here. Various axial boundary conditions models used to compute the EM field are considered. The RF magnetic field is weakly influenced by the plasma while the electric field components are strongly disturbed due to space-charge effects. In the plasma the transversal electric field is enhanced and the kz spectrum is narrower than in vacuum. The calculation of the resonant isotope heating is made by the Runge-Kutta method. The influence of ion-ion collisions, inhomogeneity of the static magnetic field B0, and the RF transversal magnetic field component on the ion acceleration is examined. These results are successfully compared with experiments of a minor isotope 44Ca heating measurements, made with an energy analyzer.

Characteristics of SiOx-containing hard film prepared by low temperature plasma enhanced chemical vapor deposition using hexamethyldisilazane or vinyltrimethylsilane and post oxygen plasma treatment

Energy Technology Data Exchange (ETDEWEB)

Wei, Yi-Syuan; Liu, Wan-Yu; Wu, Hsin-Ming [Department of Materials Engineering, Tatung University, Taipei, 104, Taiwan (China); Chen, Ko-Shao, E-mail: kschen@ttu.edu.tw [Department of Materials Engineering, Tatung University, Taipei, 104, Taiwan (China); Cech, Vladimir [Institute of Materials Chemistry, Brno University of Technology (Czech Republic)

2017-03-01

This study, monomers of hexamethyldisilazane (HMDSZ) and vinyltrimethylsilane (VTMS) were respectively used to deposit on the surface of polyethylene terephthalate (PET) substrate by plasma enhanced chemical vapor deposition. Oxygen plasma treatment follows the HMDSZ and VTMS deposition to produce a hydrophilic surface film on the deposited surface. Time for HMDSZ and VTMS plasma deposition was changed to investigate its influences on water contact angle, deposited film thickness, refractive index, and friction coefficient properties. The surface morphologies of the processed samples were observed by scanning electron microscope and their chemical compositions were measured by X-ray photoelectron spectroscopy. At 550 nm wavelength, the optical transmittance of PET after the HMDSZ treatment decreases from 89% to 83%, but increases from 89% to 95% for the VTMS treatment. With increase in HMDSZ and VTMS deposition times, the film thickness increases and the refractive index decreases. Result revealed by XPS, SiO{sub 2} film is formed on the sample surface after the O{sub 2} plasma treatment. The film adhesion capability by the HMDSZ+O{sub 2} and VTMS+O{sub 2} treatment was stronger than that by the HMDSZ and VTMS treatment only. The SiOx films produced by HMDSZ+O{sub 2} and VTMS+O{sub 2} treatment can increase the film hardness and improve light transmittance. - Highlights: • With increase in HMDSZ and VTMS deposition times, the film thickness increases and the refractive index decreases. • The optical transmittance of PET after the VTMS treatment increases from 89% to 95%. • The SiO{sub 2} films deposited by HMDSZ+O{sub 2} and VTMS+O{sub 2} plasma can increase the film hardness and improve light transmittance. • It is expected that they can be applied to the optical transmittance protective film on plastic substrate in the future.

Epitaxial growth of Si1−xGex alloys and Ge on Si(100) by electron-cyclotron-resonance Ar plasma chemical vapor deposition without substrate heating

International Nuclear Information System (INIS)

Ueno, Naofumi; Sakuraba, Masao; Murota, Junichi; Sato, Shigeo

2014-01-01

By using electron-cyclotron-resonance (ECR) Ar-plasma chemical vapor deposition (CVD) without substrate heating, the epitaxial growth process of Si 1−x Ge x alloy and Ge films deposited directly on dilute-HF-treated Si(100) was investigated. From the reflection high energy electron diffraction patterns of the deposited Si 1−x Ge x alloy (x = 0.50, 0.75) and Ge films on Si(100), it is confirmed that epitaxial growth can be realized without substrate heating, and that crystallinity degradation at larger film thickness is observed. The X-ray diffraction peak of the epitaxial films reveals the existence of large compressive strain, which is induced by lattice matching with the Si(100) substrate at smaller film thicknesses, as well as strain relaxation behavior at larger film thicknesses. The Ge fraction of Si 1−x Ge x thin film is in good agreement with the normalized GeH 4 partial pressure. The Si 1−x Ge x deposition rate increases with an increase of GeH 4 partial pressure. The GeH 4 partial pressure dependence of partial deposition rates [(Si or Ge fraction) × (Si 1−x Ge x thickness) / (deposition time)] shows that the Si partial deposition rate is slightly enhanced by the existence of Ge. From these results, it is proposed that the ECR-plasma CVD process can be utilized for Ge fraction control in highly-strained heterostructure formation of group IV semiconductors. - Highlights: • Si 1−x Ge x alloy and Ge were epitaxially grown on Si(100) without substrate heating. • Large strain and its relaxation behavior can be observed by X-ray diffraction. • Ge fraction of Si 1−x Ge x is equal to normalized GeH 4 partial pressure. • Si partial deposition rate is slightly enhanced by existence of Ge

Characterisation of silicon carbide films deposited by plasma-enhanced chemical vapour deposition

International Nuclear Information System (INIS)

Iliescu, Ciprian; Chen Bangtao; Wei Jiashen; Pang, A.J.

2008-01-01

The paper presents a characterisation of amorphous silicon carbide films deposited in plasma-enhanced chemical vapour deposition (PECVD) reactors for MEMS applications. The main parameter was optimised in order to achieve a low stress and high deposition rate. We noticed that the high frequency mode (13.56 MHz) gives a low stress value which can be tuned from tensile to compressive by selecting the correct power. The low frequency mode (380 kHz) generates high compressive stress (around 500 MPa) due to ion bombardment and, as a result, densification of the layer achieved. Temperature can decrease the compressive value of the stress (due to annealing effect). A low etching rate of the amorphous silicon carbide layer was noticed for wet etching in KOH 30% at 80 o C (around 13 A/min) while in HF 49% the layer is practically inert. A very slow etching rate of amorphous silicon carbide layer in XeF 2 -7 A/min- was observed. The paper presents an example of this application: PECVD-amorphous silicon carbide cantilevers fabricated using surface micromachining by dry-released technique in XeF 2

Characterization of Pb(Zr, Ti)O3 thin films fabricated by plasma enhanced chemical vapor deposition on Ir-based electrodes

International Nuclear Information System (INIS)

Lee, Hee-Chul; Lee, Won-Jong

2002-01-01

Structural and electrical characteristics of Pb(Zr, Ti)O 3 (PZT) ferroelectric thin films deposited on various Ir-based electrodes (Ir, IrO 2 , and Pt/IrO 2 ) using electron cyclotron resonance plasma enhanced chemical vapor deposition were investigated. On the Ir electrode, stoichiometric PZT films with pure perovskite phase could be obtained over a very wide range of processing conditions. However, PZT films prepared on the IrO 2 electrode contain a large amount of PbO x phases and exhibited high Pb-excess composition. The deposition characteristics were dependent on the behavior of PbO molecules on the electrode surface. The PZT thin film capacitors prepared on the Ir bottom electrode showed different electrical properties depending on top electrode materials. The PZT capacitors with Ir, IrO 2 , and Pt top electrodes showed good leakage current characteristics, whereas those with the Ru top electrode showed a very high leakage current density. The PZT capacitor exhibited the best fatigue endurance with an IrO 2 top electrode. An Ir top electrode provided better fatigue endurance than a Pt top electrode. The PZT capacitor with an Ir-based electrode is thought to be attractive for the application to ferroelectric random access memory devices because of its wide processing window for a high-quality ferroelectric film and good polarization, fatigue, and leakage current characteristics

A comparative study of nitrogen plasma effect on field emission characteristics of single wall carbon nanotubes synthesized by plasma enhanced chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Kumar, Avshish; Parveen, Shama; Husain, Samina; Ali, Javid [Department of Physics, Jamia Millia Islamia (A Central University), New Delhi 110025 (India); Zulfequar, Mohammad [Department of Physics, Jamia Millia Islamia (A Central University), New Delhi 110025 (India); Centre for Nanoscience and Nanotechnology, Jamia Millia Islamia (A Central University), New Delhi 110025 (India); Harsh [Centre for Nanoscience and Nanotechnology, Jamia Millia Islamia (A Central University), New Delhi 110025 (India); Husain, Mushahid, E-mail: mush_reslab@rediffmail.com [Department of Physics, Jamia Millia Islamia (A Central University), New Delhi 110025 (India); Centre for Nanoscience and Nanotechnology, Jamia Millia Islamia (A Central University), New Delhi 110025 (India)

2014-12-15

Highlights: • Vertically aligned single wall carbon nanotubes (SWCNTs) have been successfully grown on nickel (Ni) deposited silicon substrate. • The diameter distribution of the grown (SWCNTs) is in the range 1–2 nm. • A current density of 25.0 mA/cm{sup 2} at 1.9 V/μm of the grown SWCNTs is observed with a high turn-on field (E{sub to}) of 1.3 V/μm. • After N{sub 2} nitrogen plasma treatment, huge current density of 81.5 mA/cm{sup 2} at 2.0 V/μm was recorded with low E{sub to} of 1.2 V/μm. • The comparison of these two typical results indicates a drastic enhancement in the field emission properties after plasma treatments. - Abstract: Vertically aligned single wall carbon nanotubes (SWCNTs) with large scale control of diameter, length and alignment have successfully been grown by plasma enhanced chemical vapor deposition (PECVD) system. The nickel (Ni) as catalyst deposited on silicon (Si) substrate was used to grow the SWCNTs. Field emission (FE) characteristics of the as grown SWCNTs were measured using indigenously designed setup in which a diode is configured in such a way that by applying negative voltage on the copper plate (cathode) with respect to stainless steel anode plate, current density can be recorded. To measure the FE characteristics, SWCNTs film pasted on the copper plate with silver epoxy was used as electron emitter source. The effective area of anode was ∼78.5 mm{sup 2} for field emission measurements. The emission measurements were carried out under high vacuum pressure of the order of 10{sup −6} Torr to minimize the electron scattering and degradation of the emitters. The distance between anode and cathode was kept 500 μm (constant) during entire field emission studies. The grown SWCNTs are excellent field emitters, having emission current density higher than 25 mA/cm{sup 2} at turn-on field 1.3 V/μm. In order to enhance the field emission characteristics, the as grown SWCNTs have been treated under nitrogen (N{sub 2

Plasma resonance in anisotropic layered high-Tc superconductors

DEFF Research Database (Denmark)

Sakai, Shigeki; Pedersen, Niels Falsig

1999-01-01

The plasma resonance is described theoretically by the inductive coupling model for a large stacked Josephson-junction system such as the intrinsic Josephson-junction array in anisotropic high- T-c superconductors. Eigenmodes of the plasma oscillation are analytically described and a numerical...

Non linear excitation of waves at the vicinity of plasma resonance

International Nuclear Information System (INIS)

Chiron, Arnaud

1992-01-01

This research thesis reports the study of the non linear evolution of ionic acoustic and plasma waves excited by resonant absorption of an electromagnetic wave, in a non collisional plasma, without external magnetic field, and with a parabolic density profile. The plasma resonance occurs about the density profile peak. The numerical resolution of the Zakharov equation system is performed to describe the coupled evolution of the plasma wave electric field envelope, and low frequency density disturbances. Experiments performed in the microwave domain show the existence of a new effect related to the modification of the electromagnetic wave propagation under the influence of plasma density disturbances created by the ponderomotive force. This effect which results in a collisional relaxation of plasma waves trapped in the cavity formed at resonance, cannot be taken into account by a numerical simulation using a capacitive pump field. Measurements showed that plasma waves were trapped and relaxing in a cavity with characteristic dimensions of some thousands of Debye lengths, and that the plasma wave in the cavity was stationary. A new turbulence regime is thus highlighted [fr

Resolving the nanostructure of plasma-enhanced chemical vapor deposited nanocrystalline SiOx layers for application in solar cells

Science.gov (United States)

Klingsporn, M.; Kirner, S.; Villringer, C.; Abou-Ras, D.; Costina, I.; Lehmann, M.; Stannowski, B.

2016-06-01

Nanocrystalline silicon suboxides (nc-SiOx) have attracted attention during the past years for the use in thin-film silicon solar cells. We investigated the relationships between the nanostructure as well as the chemical, electrical, and optical properties of phosphorous, doped, nc-SiO0.8:H fabricated by plasma-enhanced chemical vapor deposition. The nanostructure was varied through the sample series by changing the deposition pressure from 533 to 1067 Pa. The samples were then characterized by X-ray photoelectron spectroscopy, spectroscopic ellipsometry, Raman spectroscopy, aberration-corrected high-resolution transmission electron microscopy, selected-area electron diffraction, and a specialized plasmon imaging method. We found that the material changed with increasing pressure from predominantly amorphous silicon monoxide to silicon dioxide containing nanocrystalline silicon. The nanostructure changed from amorphous silicon filaments to nanocrystalline silicon filaments, which were found to cause anisotropic electron transport.

Resonance Raman Optical Activity and Surface Enhanced Resonance Raman Optical Activity analysis of Cytochrome C

DEFF Research Database (Denmark)

Johannessen, Christian; Abdali, Salim; White, Peter C.

2007-01-01

High quality Resonance Raman (RR) and resonance Raman Optical Activity (ROA) spectra of cytochrome c were obtained in order to perform full assignment of spectral features of the resonance ROA spectrum. The resonance ROA spectrum of cytochrome c revealed a distinct spectral signature pattern due...... to resonance enhanced skeletal porphyrin vibrations, more pronounced than any contribution from the protein back-bone. Combining the intrinsic resonance enhancement of cytochrome c with surface plasmon enhancement by colloidal silver particles, the Surface Enhanced Resonance Raman Scattering (SERRS) and Chiral...... Enhanced Raman Spectroscopy (ChERS) spectra of the protein were successfully obtained at very low concentration (as low as 1 µM). The assignment of spectral features was based on the information obtained from the RR and resonance ROA spectra. Excellent agreement between RR and SERRS spectra is reported...

Coherent enhancement of resonance-mediated multiphoton absorption

International Nuclear Information System (INIS)

Zhang, Shian; Zhang, Hui; Jia, Tianqing; Wang, Zugeng; Sun, Zhenrong

2010-01-01

In this paper, we theoretically investigate the coherent enhancement of resonance-mediated (2+2) four-photon absorption. It is found that by shaping the spectral phase with a π phase step, the resonance-mediated (2+2) four-photon transition probability can be enhanced. Furthermore, the coherent enhancement dependences on the detuning between the two two-photon absorptions, laser spectral bandwidth and laser centre frequency are explicitly discussed and analysed. We believe these theoretical results may play an important role in enhancing more complex resonance-mediated multiphoton absorption processes.

Computational study of plasma-assisted photoacoustic response from gold nanoparticles irradiated by off-resonance ultrafast laser

Energy Technology Data Exchange (ETDEWEB)

Hatef, Ali, E-mail: alih@nipissingu.ca; Darvish, Behafarid [Nipissing University, Nipissing Computational Physics Laboratory (NCPL), Department of Computer Science and Mathematics (Canada); Sajjadi, Amir Yousef [Massachusetts General Hospital, Cutaneous Biology Research Center (United States)

2017-02-15

The gold nanoparticles (AuNPs) are capable of enhancing the incident laser field in the form of scattered near field for even an off-resonance irradiation where the incident laser wavelength is far away from the localized surface plasmon resonance (LSPR). If the intensity of the pulse laser is large enough, this capability can be employed to generate a highly localized free electron (plasma) in the vicinity of the particles. The generated plasma can absorb more energy during the pulse, and this energy deposition can be considered as an energy source for structural mechanics calculations in the surrounding media to generate a photoacoustic (PA) signal. To show this, in this paper, we model plasma-mediated PA pressure wave propagation from a 100-nm AuNPs and the surrounding media irradiated by an ultrashort pulse laser. In this model, the AuNP is immersed in water and the laser pulse width is ranging from 70 fs to 2 ps at the wavelength of 800 nm (off-resonance). Our results qualitatively show the substantial impact of the energy deposition in plasma on the PA signal through boosting the pressure amplitudes up to ∼1000 times compared to the conventional approach.

Computational study of plasma-assisted photoacoustic response from gold nanoparticles irradiated by off-resonance ultrafast laser

International Nuclear Information System (INIS)

Hatef, Ali; Darvish, Behafarid; Sajjadi, Amir Yousef

2017-01-01

The gold nanoparticles (AuNPs) are capable of enhancing the incident laser field in the form of scattered near field for even an off-resonance irradiation where the incident laser wavelength is far away from the localized surface plasmon resonance (LSPR). If the intensity of the pulse laser is large enough, this capability can be employed to generate a highly localized free electron (plasma) in the vicinity of the particles. The generated plasma can absorb more energy during the pulse, and this energy deposition can be considered as an energy source for structural mechanics calculations in the surrounding media to generate a photoacoustic (PA) signal. To show this, in this paper, we model plasma-mediated PA pressure wave propagation from a 100-nm AuNPs and the surrounding media irradiated by an ultrashort pulse laser. In this model, the AuNP is immersed in water and the laser pulse width is ranging from 70 fs to 2 ps at the wavelength of 800 nm (off-resonance). Our results qualitatively show the substantial impact of the energy deposition in plasma on the PA signal through boosting the pressure amplitudes up to ∼1000 times compared to the conventional approach.

Optimization of silicon oxynitrides by plasma-enhanced chemical vapor deposition for an interferometric biosensor

Science.gov (United States)

Choo, Sung Joong; Lee, Byung-Chul; Lee, Sang-Myung; Park, Jung Ho; Shin, Hyun-Joon

2009-09-01

In this paper, silicon oxynitride layers deposited with different plasma-enhanced chemical vapor deposition (PECVD) conditions were fabricated and optimized, in order to make an interferometric sensor for detecting biochemical reactions. For the optimization of PECVD silicon oxynitride layers, the influence of the N2O/SiH4 gas flow ratio was investigated. RF power in the PEVCD process was also adjusted under the optimized N2O/SiH4 gas flow ratio. The optimized silicon oxynitride layer was deposited with 15 W in chamber under 25/150 sccm of N2O/SiH4 gas flow rates. The clad layer was deposited with 20 W in chamber under 400/150 sccm of N2O/SiH4 gas flow condition. An integrated Mach-Zehnder interferometric biosensor based on optical waveguide technology was fabricated under the optimized PECVD conditions. The adsorption reaction between bovine serum albumin (BSA) and the silicon oxynitride surface was performed and verified with this device.

Preparation of carbon nanotubes with different morphology by microwave plasma enhanced chemical vapour deposition

Energy Technology Data Exchange (ETDEWEB)

Duraia, El-Shazly M. [Suez Canal University, Faculty of Science, Physics Department, Ismailia (Egypt); Al-Farabi Kazakh National University, 71 Al-Farabi av., 050038 Almaty (Kazakhstan); Institute of Physics and Technology, Ibragimov Street 11, 050032 Almaty (Kazakhstan); Mansurov, Zulkhair [Al-Farabi Kazakh National University, 71 Al-Farabi av., 050038 Almaty (Kazakhstan); Tokmoldin, S.Zh. [Institute of Physics and Technology, Ibragimov Street 11, 050032 Almaty (Kazakhstan)

2010-04-15

In this work we present a part of our results about the preparation of carbon nanotube with different morphologies by using microwave plasma enhanced chemical vapour deposition MPECVD. Well aligned, curly, carbon nanosheets, coiled carbon sheets and carbon microcoils have been prepared. We have investigated the effect of the different growth condition parameters such as the growth temperature, pressure and the hydrogen to methane flow rate ratio on the morphology of the carbon nanotubes. The results showed that there is a great dependence of the morphology of carbon nanotubes on these parameters. The yield of the carbon microcoils was high when the growth temperature was 700 C. There is a linear relation between the growth rate and the methane to hydrogen ratio. The effect of the gas pressure on the CNTs was also studied. Our samples were investigated by scanning electron microscope and Raman spectroscopy (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

Structural and optical characterization of self-assembled Ge nanocrystal layers grown by plasma-enhanced chemical vapor deposition.

Science.gov (United States)

Saeed, Saba; Buters, Frank; Dohnalova, Katerina; Wosinski, Lech; Gregorkiewicz, Tom

2014-10-10

We present a structural and optical study of solid-state dispersions of Ge nanocrystals prepared by plasma-enhanced chemical vapor deposition. Structural analysis shows the presence of nanocrystalline germanium inclusions embedded in an amorphous matrix of Si-rich SiO(2).Optical characterization reveals two prominent emission bands centered around 2.6 eV and 3.4 eV, and tunable by excitation energy. In addition, the lower energy band shows an excitation power-dependent blue shift of up to 0.3 eV. Decay dynamics of the observed emission contains fast (nanosecond) and slow (microseconds) components, indicating contributions of several relaxation channels. Based on these material characteristics, a possible microscopic origin of the individual emission bands is discussed.

Spectroscopic properties of nitrogen doped hydrogenated amorphous carbon films grown by radio frequency plasma-enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Hayashi, Y.; Yu, G.; Rahman, M. M.; Krishna, K. M.; Soga, T.; Jimbo, T.; Umeno, M.

2001-01-01

Nitrogen doped hydrogenated amorphous carbon thin films have been deposited by rf plasma-enhanced chemical vapor deposition using CH 4 as the source of carbon and with different nitrogen flow rates (N 2 /CH 4 gas ratios between 0 and 3), at 300 K. The dependence modifications of the optical and the structural properties on nitrogen incorporation were investigated using different spectroscopic techniques, such as, Raman spectroscopy, Fourier transform infrared spectroscopy, x-ray photoelectron spectroscopy, ultraviolet-visible (UV-VIS) spectroscopy, electron spin resonance (ESR), photoluminescence (PL) and spectroscopic ellipsometry (SE). Raman spectroscopy and IR absorption reveal an increase in sp 2 -bonded carbon or a change in sp 2 domain size with increasing nitrogen flow rate. It is found that the configuration of nitrogen atoms incorporated into an amorphous carbon network gradually changes from nitrogen atoms surrounded by three (σ bonded) to two (π bonded) neighboring carbons with increasing nitrogen flow rate. Tauc optical gap is reduced from 2.6 to 2.0 eV, and the ESR spin density and the peak-to-peak linewidth increase sharply with increasing nitrogen flow rate. Excellent agreement has been found between the measured SE data and modeled spectra, in which an empirical dielectric function of amorphous materials and a linear void distribution along the thickness have been assumed. The influence of nitrogen on the electronic density of states is explained based on the optical properties measured by UV-VIS and PL including nitrogen lone pair band. [copyright] 2001 American Institute of Physics

Broadband frequency ECR ion source concepts with large resonant plasma volumes

International Nuclear Information System (INIS)

Alton, G.D.

1995-01-01

New techniques are proposed for enhancing the performances of ECR ion sources. The techniques are based on the use of high-power, variable-frequency, multiple-discrete-frequency, or broadband microwave radiation, derived from standard TWT technology, to effect large resonant ''volume'' ECR sources. The creation of a large ECR plasma ''volume'' permits coupling of more power into the plasma, resulting in the heating of a much larger electron population to higher energies, the effect of which is to produce higher charge state distributions and much higher intensities within a particular charge state than possible in present forms of the ECR ion source. If successful, these developments could significantly impact future accelerator designs and accelerator-based, heavy-ion-research programs by providing multiply-charged ion beams with the energies and intensities required for nuclear physics research from existing ECR ion sources. The methods described in this article can be used to retrofit any ECR ion source predicated on B-minimum plasma confinement techniques

Study of selective heating at ion cyclotron resonance for the plasma separation process

International Nuclear Information System (INIS)

Compant La Fontaine, A.; Pashkovsky, V.G.

1995-01-01

The plasma separation process by ion cyclotron resonance heating (ICRH) is studied both theoretically and experimentally on two devices: the first one called ERIC (Ion Cyclotron Resonance Experiment) at Saclay (France) [P. Louvet, Proceedings of the 2nd Workshop on Separation Phenomena in Liquids and Gases, Versailles, France, 1989, edited by P. Louvet, P. Noe, and Soubbaramayer (Centre d'Etudes Nucleaires de Saclay and Cite Scientifique Parcs et Technopoles, Ile de France Sud, France, 1989), Vol. 1, p. 5] and the other one named SIRENA at the Kurchatov Institute, Moscow, Russia [A. I. Karchevskii et al., Plasma Phys. Rep. 19, 214 (1993)]. The radio frequency (RF) transversal magnetic field is measured by a magnetic probe both in plasma and vacuum and its Fourier spectrum versus the axial wave number k z is obtained. These results are in agreement with the electromagnetic (EM) field calculation model based on resolution of Maxwell equations by a time-harmonic scheme studied here. Various axial boundary conditions models used to compute the EM field are considered. The RF magnetic field is weakly influenced by the plasma while the electric field components are strongly disturbed due to space-charge effects. In the plasma the transversal electric field is enhanced and the k z spectrum is narrower than in vacuum. The calculation of the resonant isotope heating is made by the Runge--Kutta method. The influence of ion--ion collisions, inhomogeneity of the static magnetic field B 0 , and the RF transversal magnetic field component on the ion acceleration is examined. These results are successfully compared with experiments of a minor isotope 44 Ca heating measurements, made with an energy analyzer. copyright 1995 American Institute of Physics

Coating of diamond-like carbon nanofilm on alumina by microwave plasma enhanced chemical vapor deposition process.

Science.gov (United States)

Rattanasatien, Chotiwan; Tonanon, Nattaporn; Bhanthumnavin, Worawan; Paosawatyanyong, Boonchoat

2012-01-01

Diamond-like carbon (DLC) nanofilms with thickness varied from under one hundred to a few hundred nanometers have been successfully deposited on alumina substrates by microwave plasma enhanced chemical vapor deposition (MW-PECVD) process. To obtain dense continuous DLC nanofilm coating over the entire sample surface, alumina substrates were pre-treated to enhance the nucleation density. Raman spectra of DLC films on samples showed distinct diamond peak at around 1332 cm(-1), and the broad band of amorphous carbon phase at around 1550 cm(-1). Full width at half maximum height (FWHM) values indicated good formation of diamond phase in all films. The result of nano-indentation test show that the hardness of alumina samples increase from 7.3 +/- 2.0 GPa in uncoated samples to 15.8 +/- 4.5-52.2 +/- 2.1 GPa in samples coated with DLC depending on the process conditions. It is observed that the hardness values are still in good range although the thickness of the films is less than a hundred nanometer.

Fast enhancement on hydrophobicity of poplar wood surface using low-pressure dielectric barrier discharges (DBD) plasma

Energy Technology Data Exchange (ETDEWEB)

Chen, Weimin [College of Materials Science and Engineering, Nanjing Forestry University, Nanjing 210037 (China); Jiangsu Engineering Research Center of Fast-growing Trees and Agri-fiber Materials, Nanjing 210037 (China); Nanjing Suman Plasma Technology Co., Ltd, Enterprise of Graduate Research Station of Jiangsu Province, No. 3 Youyihe Road, Nanjing 210001 (China); Zhou, Xiaoyan, E-mail: zhouxiaoyan@njfu.edu.cn [College of Materials Science and Engineering, Nanjing Forestry University, Nanjing 210037 (China); Jiangsu Engineering Research Center of Fast-growing Trees and Agri-fiber Materials, Nanjing 210037 (China); Zhang, Xiaotao [College of Materials Science and Engineering, Nanjing Forestry University, Nanjing 210037 (China); Jiangsu Engineering Research Center of Fast-growing Trees and Agri-fiber Materials, Nanjing 210037 (China); Bian, Jie [Nanjing Suman Plasma Technology Co., Ltd, Enterprise of Graduate Research Station of Jiangsu Province, No. 3 Youyihe Road, Nanjing 210001 (China); Shi, Shukai; Nguyen, Thiphuong; Chen, Minzhi [College of Materials Science and Engineering, Nanjing Forestry University, Nanjing 210037 (China); Jiangsu Engineering Research Center of Fast-growing Trees and Agri-fiber Materials, Nanjing 210037 (China); Wan, Jinglin [Nanjing Suman Plasma Technology Co., Ltd, Enterprise of Graduate Research Station of Jiangsu Province, No. 3 Youyihe Road, Nanjing 210001 (China)

2017-06-15

Highlights: • Plasma working under low pressure is easy to realize industrialization. • Enhancing process finished within 75 s. • Plasma treatment leads to the increase in equilibrium contact angle by 330%. • Tinfoil film with simple chemical structure was used to reveal the mechanism. - Abstract: The hydrophilicity of woody products leads to deformation and cracks, which greatly limits its applications. Low-pressure dielectric barrier discharge (DBD) plasma using hexamethyldisiloxane was applied in poplar wood surface to enhance the hydrophobicity. The chemical properties, micro-morphology, and contact angles of poplar wood surface before and after plasma treatment were investigated by attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR), x-ray photoelectron spectroscopy (XPS), scanning electron microscope and energy dispersive analysis of X-ray (SEM-EDX), atomic force microscopy (AFM), and optical contact angle measurement (OCA). Moreover, tinfoil film was used as the base to reveal the enhancement mechanism. The results showed that hexamethyldisiloxane monomer is first broken into several fragments with active sites and hydrophobic chemical groups. Meanwhile, plasma treatment results in the formation of free radicals and active sites in the poplar wood surface. Then, the fragments are reacted with free radicals and incorporated into the active sites to form a network structure based on the linkages of Si-O-Si and Si−O−C. Plasma treatment also leads to the formation of acicular nano-structure in poplar wood surface. These facts synergistically enhance the hydrophobicity of poplar wood surface, demonstrating the dramatically increase in the equilibrium contact angle by 330%.

Josephson plasma resonance in superconducting multilayers

DEFF Research Database (Denmark)

Pedersen, Niels Falsig; Sakai, S

1998-01-01

We derive an analytical solution for the Josephson plasma resonance of superconducting multilayers. This analytical solution is derived mainly for low-T-c systems with magnetic coupling between the superconducting layers. but many features of our results are more general, and thus an application...

Synthesis of few-layer graphene on a Ni substrate by using DC plasma enhanced chemical vapor deposition (PE-CVD)

International Nuclear Information System (INIS)

Kim, Jeong Hyuk; Castro, Edward Joseph; Hwang, Yong Gyoo; Lee, Choong Hun

2011-01-01

In this work, few-layer graphene (FLG) was successfully grown on polycrystalline Ni a large scale by using DC plasma enhanced chemical vapor deposition (DC PE-CVD), which may serve as an alternative route in large-scale graphene synthesis. The synthesis time had an effect on the quality of the graphene produced. The applied DC voltage, on the other hand, influenced the minimization of the defect densities in the graphene grown. We also present a method of producing a free-standing polymethyl methacrylate (PMMA)/graphene membrane on a FeCl 3(aq) solution, which could then be transferred to the desired substrate.

High Current Emission from Patterned Aligned Carbon Nanotubes Fabricated by Plasma-Enhanced Chemical Vapor Deposition

Science.gov (United States)

Cui, Linfan; Chen, Jiangtao; Yang, Bingjun; Jiao, Tifeng

2015-12-01

Vertically, carbon nanotube (CNT) arrays were successfully fabricated on hexagon patterned Si substrates through radio frequency plasma-enhanced chemical vapor deposition using gas mixtures of acetylene (C2H2) and hydrogen (H2) with Fe/Al2O3 catalysts. The CNTs were found to be graphitized with multi-walled structures. Different H2/C2H2 gas flow rate ratio was used to investigate the effect on CNT growth, and the field emission properties were optimized. The CNT emitters exhibited excellent field emission performance (the turn-on and threshold fields were 2.1 and 2.4 V/μm, respectively). The largest emission current could reach 70 mA/cm2. The emission current was stable, and no obvious deterioration was observed during the long-term stability test of 50 h. The results were relevant for practical applications based on CNTs.

Development and Testing of a High Capacity Plasma Chemical Reactor in the Ukraine

Energy Technology Data Exchange (ETDEWEB)

Reilly, Raymond W.

2012-07-30

This project, Development and Testing of a High Capacity Plasma Chemical Reactor in the Ukraine was established at the Kharkiv Institute of Physics and Technology (KIPT). The associated CRADA was established with Campbell Applied Physics (CAP) located in El Dorado Hills, California. This project extends an earlier project involving both CAP and KIPT conducted under a separate CRADA. The initial project developed the basic Plasma Chemical Reactor (PCR) for generation of ozone gas. This project built upon the technology developed in the first project, greatly enhancing the output of the PCR while also improving reliability and system control.

Electron Cyclotron Resonance Heating of a High-Density Plasma

DEFF Research Database (Denmark)

Hansen, F. Ramskov

1986-01-01

Various schemes for electron cyclotron resonance heating of tokamak plasmas with the ratio of electron plasma frequency to electron cyclotron frequency, "»pe/^ce* larger than 1 on axis, are investigated. In particular, a mode conversion scheme is investigated using ordinary waves at the fundamental...... of the electron cyclotron frequency. These are injected obliquely from the outside of the tokamak near an optimal angle to the magnetic field lines. This method involves two mode conversions. The ordinary waves are converted into extraordinary waves near the plasma cut-off layer. The extraordinary waves...... are subsequently converted into electrostatic electron Bernstein waves at the upper hybrid resonance layer, and the Bernstein waves are completely absorbed close to the plasma centre. Results are presented from ray-tracinq calculations in full three-dimensional geometry using the dispersion function for a hot non...

Resonance-enhanced multiphoton ionization (REMPI) spectroscopy of p-chlorofluorobenzene

Science.gov (United States)

Tuttle, William D.; Gardner, Adrian M.; Wright, Timothy G.

2017-09-01

The S1 ← S0 (A˜1 B2 ← X˜1 A1) electronic transition of para-chlorofluorobenzene has been investigated using resonance-enhanced multiphoton ionization (REMPI) spectroscopy. Assignment of the vibrational structure has been achieved by comparison with corresponding spectra of related molecules, via quantum chemical calculations, and via shifts in bands between the spectra of the 35Cl and 37Cl isotopologues. In addition, we have also partially reassigned a previously-published spectrum of para-dichlorobenzene.

Effects of Surface Modification of Nanodiamond Particles for Nucleation Enhancement during Its Film Growth by Microwave Plasma Jet Chemical Vapour Deposition Technique

Directory of Open Access Journals (Sweden)

Chii-Ruey Lin

2014-01-01

Full Text Available The seedings of the substrate with a suspension of nanodiamond particles (NDPs were widely used as nucleation seeds to enhance the growth of nanostructured diamond films. The formation of agglomerates in the suspension of NDPs, however, may have adverse impact on the initial growth period. Therefore, this paper was aimed at the surface modification of the NDPs to enhance the diamond nucleation for the growth of nanocrystalline diamond films which could be used in photovoltaic applications. Hydrogen plasma, thermal, and surfactant treatment techniques were employed to improve the dispersion characteristics of detonation nanodiamond particles in aqueous media. The seeding of silicon substrate was then carried out with an optimized spin-coating method. The results of both Fourier transform infrared spectroscopy and dynamic light scattering measurements demonstrated that plasma treated diamond nanoparticles possessed polar surface functional groups and attained high dispersion in methanol. The nanocrystalline diamond films deposited by microwave plasma jet chemical vapour deposition exhibited extremely fine grain and high smooth surfaces (~6.4 nm rms on the whole film. These results indeed open up a prospect of nanocrystalline diamond films in solar cell applications.

On the kinetic theory of parametric resonance in relativistic plasma

International Nuclear Information System (INIS)

El-Ashry, M.Y.

1982-08-01

The instability of relativistic hot plasma located in high-frequency external electric field is studied. The dispersion relation, in the case when the plasma electrons have relativistic oscillatory motion, is obtained. It is shown that if the electron Deby's radius is less than the wave length of plasma oscillation and far from the resonance on the overtones of the external field frequency, the oscillation build-up is possible. It is also shown that taking into account the relativistic motion of electrons leads to a considerable decrease in the frequency at which the parametric resonance takes place. (author)

Self-excited nonlinear plasma series resonance oscillations in geometrically symmetric capacitively coupled radio frequency discharges

International Nuclear Information System (INIS)

Donko, Z.; Schulze, J.; Czarnetzki, U.; Luggenhoelscher, D.

2009-01-01

At low pressures, nonlinear self-excited plasma series resonance (PSR) oscillations are known to drastically enhance electron heating in geometrically asymmetric capacitively coupled radio frequency discharges by nonlinear electron resonance heating (NERH). Here we demonstrate via particle-in-cell simulations that high-frequency PSR oscillations can also be excited in geometrically symmetric discharges if the driving voltage waveform makes the discharge electrically asymmetric. This can be achieved by a dual-frequency (f+2f) excitation, when PSR oscillations and NERH are turned on and off depending on the electrical discharge asymmetry, controlled by the phase difference of the driving frequencies

Laboratory studies of the dynamic of resonance cones formation in magnetized plasmas

Energy Technology Data Exchange (ETDEWEB)

Nazarov, V. V.; Starodubtsev, M. V.; Kostrov, A. V. [Russian Academy of Sciences, Institute of Applied Physics, Nizhny Novgorod (Russian Federation)

2013-03-15

The paper is devoted to experimental studies of formation of resonance cones in magnetized plasmas by pulsed RF source in the lower-hybrid (whistler) and the upper-hybrid frequency ranges. It is shown that in both frequency ranges, resonance cones exhibit similar dynamics after switching-on the RF source: at first, wide maxima of radiation are formed in non-resonance directions, which then become narrower, with their direction approaching the resonance one. While the resonance cones are being formed, one observes a fine structure in the form of secondary radiation maxima. It is shown that the characteristic formation time of stationary resonance cones is determined by the minimal value of the group velocity of the quasi-electrostatic waves excited by the antenna. In the low-temperature plasma, this value is limited in the lower-hybrid frequency range by the spatial spectrum of the emitting antenna and in the upper-hybrid range, by the effects of spatial plasma dispersion.

Whispering Gallery Mode Spectroscopy as a Diagnostic for Dusty Plasmas

International Nuclear Information System (INIS)

Thieme, G.; Basner, R.; Ehlbeck, J.; Roepcke, J.; Maurer, H.; Kersten, H.; Davies, P. B.

2008-01-01

Whispering-gallery-mode spectroscopy is being assessed as a diagnostic method for the characterisation of size and chemical composition of spherical particles levitated in a plasma. With a pulsed laser whispering gallery modes (cavity resonances) are excited in individual microspheres leading to enhanced Raman scattering or fluorescence at characteristic wavelengths. This method can be used to gain specific information from the particle surface and is thus of great interest for the characterisation of layers deposited on microparticles, e.g. in molecular plasmas. We present investigations of different microparticles in air and results from fluorescent particles levitated in an Argon rf plasma.

Analytical investigation of microwave resonances of a curling probe for low and high-pressure plasma diagnostics

Science.gov (United States)

Arshadi, Ali; Brinkmann, Ralf Peter

2017-01-01

The concept of ‘active plasma resonance spectroscopy’ (APRS) has attracted greater interest in recent years as an established plasma diagnostic technique. The APRS describes a class of related methods utilizing the intrinsic ability of plasma to resonate at or near the electron plasma frequency {ω\\text{pe}} . The Curling probe (CP) as a novel realization of the APRS idea, is a miniaturized spiral slot embedded flatly in the chamber wall. Consequently, a plasma diagnostic technique with minimum disturbance and without metal contamination can be developed. To measure the plasma parameters the CP is fed with a weak frequency-swept signal from the exterior of the plasma chamber by a network analyzer which also records the response of the plasma versus the frequency. The resonance behavior is strongly dependent on the electron density and the gas pressure. The CP has also the advantage of resonating at a frequency greater than {ω\\text{pe}} which is dependent on the spiral’s length. The double resonance characteristic gives the CP the ability to be applied in varying plasma regimes. Assuming that the spiralization does not have a considerable effect on the resonances, a ‘straightened’ infinite length CP has recently been investigated (Arshadi and Brinkmann 2016 Plasma Sources Sci. Technol. 25 045014) to obtain the surface wave resonances. This work generalizes the approach and models the CP by a rectangular slot-type resonator located between plasma and quartz. Cold plasma theory and Maxwell’s equations are utilized to compute the electromagnetic fields propagating into the plasma by the diffraction of an incident plane wave at the slot. A mathematical model is employed and both kinds of resonances are derived. The analytical study of this paper shows good agreement with the numerical results of the probe inventors.

An economic analysis of the deposition of electrochromic WO3 via sputtering or plasma enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Garg, D.; Henderson, P.B.; Hollingsworth, R.E.; Jensen, D.G.

2005-01-01

The costs of manufacturing electrochromic WO 3 thin films deposited by either radio frequency plasma enhanced chemical vapor deposition (PECVD) or DC reactive magnetron sputtering of metal targets were modeled. Both inline systems for large area glass substrates and roll-to-roll systems for flexible webs were compared. Costs of capital, depreciation, raw materials, labor, power, and other miscellaneous items were accounted for in the model. The results predict that on similar sized systems, PECVD can produce electrochromic WO 3 for as little as one-third the cost, and have more than 10 times the annual production capacity of sputtering. While PECVD cost is dominated by raw materials, primarily WF 6 , sputtering cost is dominated by labor and depreciation

Resonance reactions and enhancement of weak interactions in collisions of cold molecules

International Nuclear Information System (INIS)

Flambaum, V. V.; Ginges, J. S. M.

2006-01-01

With the creation of ultracold atoms and molecules, a new type of chemistry - 'resonance' chemistry - emerges: chemical reactions can occur when the energy of colliding atoms and molecules matches a bound state of the combined molecule (Feshbach resonance). This chemistry is rather similar to reactions that take place in nuclei at low energies. In this paper we suggest some problems for future experimental and theoretical work related to the resonance chemistry of ultracold molecules. Molecular Bose-Einstein condensates are particularly interesting because in this system collisions and chemical reactions are extremely sensitive to weak fields; also, a preferred reaction channel may be enhanced due to a finite number of final states. The sensitivity to weak fields arises due to the high density of narrow compound resonances and the macroscopic number of molecules with kinetic energy E=0 (in the ground state of a mean-field potential). The high sensitivity to the magnetic field may be used to measure the distribution of energy intervals, widths, and magnetic moments of compound resonances and study the onset of quantum chaos. A difference in the production rate of right-handed and left-handed chiral molecules may be produced by external electric E and magnetic B fields and the finite width Γ of the resonance (correlation ΓE·B). The same effect may be produced by the parity-violating energy difference in chiral molecules

Resonant and Ground Experimental Study on the Microwave Plasma Thruster

Science.gov (United States)

Yang, Juan; He, Hongqing; Mao, Genwang; Qu, Kun; Tang, Jinlan; Han, Xianwei

2002-01-01

chemistry. Therefore, the application of EP for the attitude control and station keeping of satellite, the propulsion of deep space exploration craft allows to reduce substantially the mass of on-board propellant and the launching cost. The EP research is now receiving high interest everywhere. microwave generating subsystem, the propellant supplying subsystem and the resonator (the thruster). Its principle is that the magnetron of the microwave generating subsystem transfers electric energy into microwave energy at given frequency which is introduced into a resonant cavity. Microwave will resonate within the cavity when it is adjusted. When the propellant gas (N2, Ar, He, NH3 or H2) is put into the cavity and coupled with microwave energy at the maximal electric intensity place, it will be broken down to form free-floating plasma, which flows from nozzle with high speed to produce thrust. Its characteristic is high efficiency, simple power supply and without electrode ablation, its specific impulse is greater than arcjet. 2450MHz, have been developed. The microwave generating subsystem and resonator of lower power MPT, 70-200W, are coaxial. The resonator with TEM resonating mode is section of coaxial wave-guide, of which one end is shorted, another is semi-opened. The maximal electric intensity field is in the lumped capacity formed between the end surface of inner conductor, retracting in the cavity, and the semi-opened surface of outer conductor. It provides favorable condition for gas breakdown. The microwave generating system and resonator of middle power MPT, 500-1,000W, are wave-guide cavity. The resonator with TM011 resonating mode is cylinder wave-guide cavity, of which two end surface are shorted. The distribution of electromagnetic field is axial symmetry, its maximal electric intensity field locates on the axis and closes to the exit of nozzle, where the propellant gas is breakdown to form free floating plasma. The plasma is free from the wall of

Atmospheric pressure plasma enhanced chemical vapor deposition of zinc oxide and aluminum zinc oxide

International Nuclear Information System (INIS)

Johnson, Kyle W.; Guruvenket, Srinivasan; Sailer, Robert A.; Ahrenkiel, S. Phillip; Schulz, Douglas L.

2013-01-01

Zinc oxide (ZnO) and aluminum-doped zinc oxide (AZO) thin films were deposited via atmospheric pressure plasma enhanced chemical vapor deposition. A second-generation precursor, bis(1,1,1,5,5,5-hexafluoro-2,4-pentanedionato)(N,N′-diethylethylenediamine) zinc, exhibited significant vapor pressure and good stability at one atmosphere where a vaporization temperature of 110 °C gave flux ∼ 7 μmol/min. Auger electron spectroscopy confirmed that addition of H 2 O to the carrier gas stream mitigated F contamination giving nearly 1:1 metal:oxide stoichiometries for both ZnO and AZO with little precursor-derived C contamination. ZnO and AZO thin film resistivities ranged from 14 to 28 Ω·cm for the former and 1.1 to 2.7 Ω·cm for the latter. - Highlights: • A second generation precursor was utilized for atmospheric pressure film growth. • Addition of water vapor to the carrier gas stream led to a marked reduction of ZnF 2 . • Carbonaceous contamination from the precursor was minimal

Nonlinear plasma waves excited near resonance

International Nuclear Information System (INIS)

Cohen, B.I.; Kaufman, A.N.

1977-01-01

The nonlinear resonant response of a uniform plasma to an external plane-wave field is formulated in terms of the mismatch Δ/sub n l/ between the driving frequency and the time-dependent, complex, nonlinear normal mode frequency at the driving wavenumber. This formalism is applied to computer simulations of this process, yielding a deduced nonlinear frequency shift. The time dependence of the nonlinear phenomena, at frequency Δ/sub n l/ and at the bounce frequency of the resonant particles, is analyzed. The interdependence of the nonlinear features is described by means of energy and momentum relations

Wave propagation near the lower hybrid resonance in toroidal plasmas

International Nuclear Information System (INIS)

Ohkubo, K.; Ohasa, K.; Matsuura, K.

1975-10-01

Dielectric tensor and equipotential curves (ray trajectories) of an electrostatic wave near the lower hybrid resonance are investigated for the toroidal plasma with a shear magnetic field. The ray trajectories start from the vicinity of the plasma surface, and rotate in a spiral form around the magnetic axis, and then reach the lower or upper parts of lower hybrid resonance layer. The numerical computations are performed on the parameters of JIPP T-II device with two dimensional inhomogeneity. (auth.)

Propagation of quasi-static wave and resonance cone in magnetized plasma

International Nuclear Information System (INIS)

Serbeto, A.P.B.

1980-08-01

The potential created by an oscillating punctual source in a magnetized homogeneous cold plasma, using quasistatic approximation is studied. The resonance cone structure in this plasma is theoretically obtained and it is verified that the conic field structure remains finite for an inhomogeneous cold plasma. The temperature effect in the resonance cone structure in layers where w->Ω e ,w->w PC and w->w nh for magnetized homogeneous electron plasma is studied. An approximated expression for dispersion relations is obtained, so that an analytical solution for the potential in these layers can be calculated. The theorem of energy conservation for quasistatic waves is developed. (M.C.K.) [pt

Self-resonant wakefield excitation by intense laser pulse in plasmas

International Nuclear Information System (INIS)

Andreev, N.E.; Pogosova, A.A.; Gorbunov, L.M.; Ramazashvili, R.R.; Kirsanov, V.I.

1993-01-01

It is demonstrated by theoretical analysis and numerical calculations that in an underdense plasma the process of three-dimensional evolution of the short and strong laser pulse (with duration equal to several plasma periods) leads to compression and self-modulation of the pulse, so that during a fairly long period of time beats of pulse amplitude generates resonantly a strong and stable plasma wakefield. The intensity of the wake-field is so high that it can provide a new promising outlook for the plasma based accelerator concept. Linear analysis of dispersion relation predicts that taking into account transverse component of wavenumber considerably increases the growth rate of resonance instability of the pulse. The numerical simulations demonstrate that considered self-focusing and resonant-modulation instability are essentially three dimensional processes. Laser field evolution in each transverse cross section of the pulse is synchronized by the regular structure of plasma wave that is excited by the pulse. The considered effect of resonant modulation has a threshold. For the pulses with the intensity below the threshold the refraction dominates and no modulation appears. The studied phenomenon can be referred to as the Self-Resonant Wakefield (SRWF) excitation that is driven by self-focusing and self-modulation of laser pulse with quite a moderate initial duration. In fact, this method of excitation differs from both suggested in Ref.1 (PBWA) and in Refs.2,3 (LWFA), being even more than the combination of these concepts. Unlike the first scheme it does not require initially the two-frequency laser pulse, since the modulation here appears in the most natural way due to evolution of the pulse. In contrast with the LWFA, the considered SRWF generation scheme gives the possibility to raise the intensity of wake-excitation due to pulse self-focusing ( initial stage) and self modulation (second stage)

A simple method to deposit palladium doped SnO2 thin films using plasma enhanced chemical vapor deposition technique

International Nuclear Information System (INIS)

Kim, Young Soon; Wahab, Rizwan; Shin, Hyung-Shik; Ansari, S. G.; Ansari, Z. A.

2010-01-01

This work presents a simple method to deposit palladium doped tin oxide (SnO 2 ) thin films using modified plasma enhanced chemical vapor deposition as a function of deposition temperature at a radio frequency plasma power of 150 W. Stannic chloride (SnCl 4 ) was used as precursor and oxygen (O 2 , 100 SCCM) (SCCM denotes cubic centimeter per minute at STP) as reactant gas. Palladium hexafluroacetyleacetonate (Pd(C 5 HF 6 O 2 ) 2 ) was used as a precursor for palladium. Fine granular morphology was observed with tetragonal rutile structure. A peak related to Pd 2 Sn is observed, whose intensity increases slightly with deposition temperature. Electrical resistivity value decreased from 8.6 to 0.9 mΩ cm as a function of deposition temperature from 400 to 600 deg. C. Photoelectron peaks related to Sn 3d, Sn 3p3, Sn 4d, O 1s, and C 1s were detected with varying intensities as a function of deposition temperature.

Ultraviolet Resonant Raman Enhancements in the Detection of Explosives

Energy Technology Data Exchange (ETDEWEB)

Short Jr., Billy Joe [Naval Postgraduate School, Monterey, CA (United States)

2009-06-01

Raman-based spectroscopy is potentially militarily useful for standoff detection of high explosives. Normal (non-resonance) and resonance Raman spectroscopies are both light scattering techniques that use a laser to measure the vibrational spectrum of a sample. In resonance Raman, the laser is tuned to match the wavelength of a strong electronic absorbance in the molecule of interest, whereas, in normal Raman the laser is not tuned to any strong electronic absorbance bands. The selection of appropriate excitation wavelengths in resonance Raman can result in a dramatic increase in the Raman scattering efficiency of select band(s) associated with the electronic transition. Other than the excitation wavelength, however, resonance Raman is performed experimentally the same as normal Raman. In these studies, normal and resonance Raman spectral signatures of select solid high explosive (HE) samples and explosive precursors were collected at 785 nm, 244 nm and 229 nm. Solutions of PETN, TNT, and explosive precursors (DNT & PNT) in acetonitrile solvent as an internal Raman standard were quantitatively evaluated using ultraviolet resonance Raman (UVRR) microscopy and normal Raman spectroscopy as a function of power and select excitation wavelengths. Use of an internal standard allowed resonance enhancements to be estimated at 229 nm and 244 nm. Investigations demonstrated that UVRR provided ~2000-fold enhancement at 244 nm and ~800-fold improvement at 229 nm while PETN showed a maximum of ~25-fold at 244 nm and ~190-fold enhancement at 229 nm solely from resonance effects when compared to normal Raman measurements. In addition to the observed resonance enhancements, additional Raman signal enhancements are obtained with ultraviolet excitation (i.e., Raman scattering scales as !4 for measurements based on scattered photons). A model, based partly on the resonance Raman enhancement results for HE solutions, is presented for estimating Raman enhancements for solid HE samples.

Josephson plasma resonance in vortex filament state of high temperature superconductors

International Nuclear Information System (INIS)

Matsuda, Yuji; Gaifullin, M.B.

1996-01-01

High temperature superconductors have the crystalline structure in which two-dimensional CuO 2 planes are piled in layers, consequently, the anisotropy of electroconductivity arises, and this brings about stable and low energy Josephson plasma in superconducting state. Also as to the vortex filament state of high temperature superconductors, the effect of thermal fluctuation due to low dimensionality, short coherence length and high transition temperature becomes conspicuous. In reality, these plasma and vortex filament state are related closely. Light reflection and plasma edge in superconducting state, Josephson plasma resonance in the vortex filament state of BiO 2 Sr 2 CaCu 2 O 8+δ , the plasma vibration in Josephson junction, Josephson plasma in magnetic field, Josephson plasma in the liquid state of vortex filament, Josephson plasma in the solid state of vortex filament, and Josephson plasma in parallel magnetic field are reported. The Josephson plasma resonance is the experimental means for exploring vortex filament state from microscopic standpoint, and its development hereafter is expected. (K.I.)

Si Nano wires Produced by Very High Frequency Plasma Enhanced Chemical Vapor Deposition (PECVD) via VLS Mechanism

International Nuclear Information System (INIS)

Yussof Wahab; Yussof Wahab; Habib Hamidinezhad; Habib Hamidinezhad

2013-01-01

Silicon nano wires (SiNWs) with diameter of about a few nanometers and length of 3 μm on silicon wafers were synthesized by very high frequency plasma enhanced chemical vapor deposition. Scanning electron microscopy (SEM) observations showed that the silicon nano wires were grown randomly and energy-dispersive X-ray spectroscopy analysis indicates that the nano wires have the composition of Si, Au and O elements. The SiNWs were characterized by high resolution transmission electron microscopy (HRTEM) and Raman spectroscopy. SEM micrographs displayed SiNWs that are needle-like with a diameter ranged from 30 nm at the top to 100 nm at the bottom of the wire and have length a few of micrometers. In addition, HRTEM showed that SiNWs consist of crystalline silicon core and amorphous silica layer. (author)

Breathing-mode resonance of a complex plasma disk

International Nuclear Information System (INIS)

Sheridan, T.E.; Buckey, C.R.; Cox, D.J.; Merrill, R.J.; Theisen, W.L.

2004-01-01

We have experimentally characterized the breathing mode oscillation of a strongly-coupled, dusty plasma disk. Steady-state oscillations are excited by sinusoidally modulating the plasma density, creating a single-frequency, in-plane driving force. Resonance curves agree well with damped harmonic oscillator theory. A response at the second harmonic is observed and found to increase with the square of the driving force, indicating a quadratic nonlinearity

Periodic modulation-based stochastic resonance algorithm applied to quantitative analysis for weak liquid chromatography-mass spectrometry signal of granisetron in plasma

Science.gov (United States)

Xiang, Suyun; Wang, Wei; Xiang, Bingren; Deng, Haishan; Xie, Shaofei

2007-05-01

The periodic modulation-based stochastic resonance algorithm (PSRA) was used to amplify and detect the weak liquid chromatography-mass spectrometry (LC-MS) signal of granisetron in plasma. In the algorithm, the stochastic resonance (SR) was achieved by introducing an external periodic force to the nonlinear system. The optimization of parameters was carried out in two steps to give attention to both the signal-to-noise ratio (S/N) and the peak shape of output signal. By applying PSRA with the optimized parameters, the signal-to-noise ratio of LC-MS peak was enhanced significantly and distorted peak shape that often appeared in the traditional stochastic resonance algorithm was corrected by the added periodic force. Using the signals enhanced by PSRA, this method extended the limit of detection (LOD) and limit of quantification (LOQ) of granisetron in plasma from 0.05 and 0.2 ng/mL, respectively, to 0.01 and 0.02 ng/mL, and exhibited good linearity, accuracy and precision, which ensure accurate determination of the target analyte.

On improved understanding of plasma-chemical processes in complex low-temperature plasmas

Science.gov (United States)

Röpcke, Jürgen; Loffhagen, Detlef; von Wahl, Eric; Nave, Andy S. C.; Hamann, Stephan; van Helden, Jean-Piere H.; Lang, Norbert; Kersten, Holger

2018-05-01

Over the last years, chemical sensing using optical emission spectroscopy (OES) in the visible spectral range has been combined with methods of mid infrared laser absorption spectroscopy (MIR-LAS) in the molecular fingerprint region from 3 to 20 μm, which contains strong rotational-vibrational absorption bands of a large variety of gaseous species. This optical approach established powerful in situ diagnostic tools to study plasma-chemical processes of complex low-temperature plasmas. The methods of MIR-LAS enable to detect stable and transient molecular species in ground and excited states and to measure the concentrations and temperatures of reactive species in plasmas. Since kinetic processes are inherent to discharges ignited in molecular gases, high time resolution on sub-second timescales is frequently desired for fundamental studies as well as for process monitoring in applied research and industry. In addition to high sensitivity and good temporal resolution, the capacity for broad spectral coverage enabling multicomponent detection is further expanding the use of OES and MIR-LAS techniques. Based on selected examples, this paper reports on recent achievements in the understanding of complex low-temperature plasmas. Recently, a link with chemical modeling of the plasma has been provided, which is the ultimate objective for a better understanding of the chemical and reaction kinetic processes occurring in the plasma. Contribution to the Topical Issue "Fundamentals of Complex Plasmas", edited by Jürgen Meichsner, Michael Bonitz, Holger Fehske, Alexander Piel.

Resonant power absorption in helicon plasma sources

International Nuclear Information System (INIS)

Chen Guangye; Arefiev, Alexey V.; Bengtson, Roger D.; Breizman, Boris N.; Lee, Charles A.; Raja, Laxminarayan L.

2006-01-01

Helicon discharges produce plasmas with a density gradient across the confining magnetic field. Such plasmas can create a radial potential well for nonaxisymmetric whistlers, allowing radially localized helicon (RLH) waves. This work presents new evidence that RLH waves play a significant role in helicon plasma sources. An experimentally measured plasma density profile in an argon helicon discharge is used to calculate the rf field structure. The calculations are performed using a two-dimensional field solver under the assumption that the density profile is axisymmetric. It is found that RLH waves with an azimuthal wave number m=1 form a standing wave structure in the axial direction and that the frequency of the RLH eigenmode is close to the driving frequency of the rf antenna. The calculated resonant power absorption, associated with the RLH eigenmode, accounts for most of the rf power deposited into the plasma in the experiment

Ge-rich islands grown on patterned Si substrates by low-energy plasma-enhanced chemical vapour deposition

International Nuclear Information System (INIS)

Bollani, M; Fedorov, A; Chrastina, D; Sordan, R; Picco, A; Bonera, E

2010-01-01

Si 1-x Ge x islands grown on Si patterned substrates have received considerable attention during the last decade for potential applications in microelectronics and optoelectronics. In this work we propose a new methodology to grow Ge-rich islands using a chemical vapour deposition technique. Electron-beam lithography is used to pre-pattern Si substrates, creating material traps. Epitaxial deposition of thin Ge films by low-energy plasma-enhanced chemical vapour deposition then leads to the formation of Ge-rich Si 1-x Ge x islands (x > 0.8) with a homogeneous size distribution, precisely positioned with respect to the substrate pattern. The island morphology was characterized by atomic force microscopy, and the Ge content and strain in the islands was studied by μRaman spectroscopy. This characterization indicates a uniform distribution of islands with high Ge content and low strain: this suggests that the relatively high growth rate (0.1 nm s -1 ) and low temperature (650 deg. C) used is able to limit Si intermixing, while maintaining a long enough adatom diffusion length to prevent nucleation of islands outside pits. This offers the novel possibility of using these Ge-rich islands to induce strain in a Si cap.

Ge-rich islands grown on patterned Si substrates by low-energy plasma-enhanced chemical vapour deposition.

Science.gov (United States)

Bollani, M; Chrastina, D; Fedorov, A; Sordan, R; Picco, A; Bonera, E

2010-11-26

Si(1-x)Ge(x) islands grown on Si patterned substrates have received considerable attention during the last decade for potential applications in microelectronics and optoelectronics. In this work we propose a new methodology to grow Ge-rich islands using a chemical vapour deposition technique. Electron-beam lithography is used to pre-pattern Si substrates, creating material traps. Epitaxial deposition of thin Ge films by low-energy plasma-enhanced chemical vapour deposition then leads to the formation of Ge-rich Si(1-x)Ge(x) islands (x > 0.8) with a homogeneous size distribution, precisely positioned with respect to the substrate pattern. The island morphology was characterized by atomic force microscopy, and the Ge content and strain in the islands was studied by μRaman spectroscopy. This characterization indicates a uniform distribution of islands with high Ge content and low strain: this suggests that the relatively high growth rate (0.1 nm s(-1)) and low temperature (650 °C) used is able to limit Si intermixing, while maintaining a long enough adatom diffusion length to prevent nucleation of islands outside pits. This offers the novel possibility of using these Ge-rich islands to induce strain in a Si cap.

Resonant photopumping of a neon lasant plasma by a sodium pump plasma

International Nuclear Information System (INIS)

Young, F.C.; Apruzese, J.P.; Burkhalter, P.G.; Cooperstein, G.; Davis, J.; Mosher, D.; Ottinger, P.F.; Scherrer, V.E.; Stephanakis, S.J.; Mehlman, C.; Welch, B.L.

1988-01-01

Resonant photopumping of heliumlike neon by helium like sodium is being investigated to extend this pumping technique to the soft x-ray region. In the Na-pump/Ne-lasant system, the 1s 2 -1s2p 1 P 1 line of Na X at 11.0027 A differs by 2 parts in 10 4 from the 1s 2 -1s 4 p 1 P 1 line of Ne 1X at 11.0003 A. This wavelength difference corresponds to about one Doppler width at the sodium plasma temperatures (200-500 eV) required for strong Na X pump radiation. Sodium line radiation of sufficient power irradiating a properly prepared neon plasma will cause overpopulation of the Ne 1X n = 4 singlet level leading to lasing in the 4-3, 4-2, and possibly 3-2 singlet transitions. Experimentally, the current pulse from the NRL Gamble-II generator is used to produce side-by-side z-pinch plasmas of sodium fluoride (NaF) and neon. The discharges are viewed radially with x-ray diagnostics including time-integrated pinhole cameras, time-resolved x-ray diodes, and a time-integrated curved-crystal spectrograph. Measurements of the neon plasma indicate that a discharge current of about 200 kA is required to produce a neon lasant with a dominant heliumlike ground-state population. For fluorescence experiments, appropriate neon lasant conditions (density of about 10 18 cm -3 and temperature of 50-100 eV) must be produced at the time of the intense sodium pump-line radiation. Fluorescence is demonstrated by observing enhancement of the 4-1 line (He-γ) from the neon plasma relative to the 3-1 line (He-γ) when the neon is pumped by sodium. An increase in this γ-to-β ratio of 25% has been observed when the sodium pump radiation is present. The results of recent experiments are reported, and their implications for future experiments are discussed

Gyrokinetic theory of perpendicular cyclotron resonance in a nonuniformly magnetized plasma

International Nuclear Information System (INIS)

Lashmore-Davies, C.N.; Dendy, R.O.

1989-01-01

The extension of gyrokinetic theory to arbitrary frequencies by Chen and Tsai [Phys. Fluids 26, 141 (1983); Plasma Phys. 25, 349 (1983)] is used to study cyclotron absorption in a straight magnetic field with a perpendicular, linear gradient in strength. The analysis includes the effects of magnetic field variation across the Larmor orbit and is restricted to propagation perpendicular to the field. It yields the following results for propagation into the field gradient. The standard optical depths for the fundamental O-mode and second harmonic X-mode resonances are obtained from the absorption profiles given in this paper, without invoking relativistic mass variation [see also Antonsen and Manheimer, Phys. Fluids 21, 2295 (1978)]. The compressional Alfven wave is shown to undergo perpendicular cyclotron damping at the fundamental minority resonance in a two-ion species plasma and at second harmonic resonance in a single-ion species plasma. Ion Bernstein waves propagating into the second harmonic resonance are no longer unattenuated, but are increasingly damped as they approach the resonance. It is shown how the kinetic power flow affects absorption profiles, yielding information previously obtainable only from full-wave theory. In all cases, the perpendicular cyclotron damping arises from the inclusion of magnetic field variation across the Larmor orbit

Edge localized mode control by resonant magnetic perturbations in tokamak plasmas

International Nuclear Information System (INIS)

Orain, Francois

2014-01-01

The growth of plasma instabilities called Edge Localized Modes (ELMs) in tokamaks results in the quasi-periodic relaxation of the edge pressure profile. These relaxations induce large heat fluxes which might be harmful for the divertor in ITER, thus ELM control is mandatory in ITER. One of the promising control methods planned in ITER is the application of external resonant magnetic perturbations (RMPs), already efficient for ELM mitigation/suppression in current tokamak experiments. However a better understanding of the interaction between ELMs, RMPs and plasma flows is needed to explain the experimental results and make reliable predictions for ITER. In this perspective, non-linear modeling of ELMs and RMPs is done with the reduced MHD code JOREK, in toroidal geometry including the X-point and the Scrape-Off Layer. The initial model has been further developed to describe self-consistent plasma flows - with the addition of the bi-fluid diamagnetic drifts, the neoclassical friction and a source of parallel rotation - and to simulate the RMP penetration consistently with the plasma response. As a first step, the plasma response to RMPs (without ELMs) is studied for JET, MAST and ITER realistic plasma parameters and geometry. The general behaviour of the plasma/RMP interaction is similar for the three studied cases: RMPs are generally screened by the formation of response currents, induced by the plasma rotation on the resonant surfaces. RMPs however penetrate at the very edge where an ergodic zone is formed. The amplification of the non-resonant spectrum of the magnetic perturbations is also observed in the core. The edge ergodization induces an enhanced transport at the edge, which slightly degrades the pedestal profiles. RMPs also generate the 3D-deformation of the plasma boundary with a maximum deformation near the X-point where lobe structures are formed. Then the full dynamics of a multi-ELM cycle (without RMPs) is modeled for the first time in realistic

Preparation of Hydrophobic Metal-Organic Frameworks via Plasma Enhanced Chemical Vapor Deposition of Perfluoroalkanes for the Removal of Ammonia

Science.gov (United States)

DeCoste, Jared B.; Peterson, Gregory W.

2013-01-01

Plasma enhanced chemical vapor deposition (PECVD) of perfluoroalkanes has long been studied for tuning the wetting properties of surfaces. For high surface area microporous materials, such as metal-organic frameworks (MOFs), unique challenges present themselves for PECVD treatments. Herein the protocol for development of a MOF that was previously unstable to humid conditions is presented. The protocol describes the synthesis of Cu-BTC (also known as HKUST-1), the treatment of Cu-BTC with PECVD of perfluoroalkanes, the aging of materials under humid conditions, and the subsequent ammonia microbreakthrough experiments on milligram quantities of microporous materials. Cu-BTC has an extremely high surface area (~1,800 m2/g) when compared to most materials or surfaces that have been previously treated by PECVD methods. Parameters such as chamber pressure and treatment time are extremely important to ensure the perfluoroalkane plasma penetrates to and reacts with the inner MOF surfaces. Furthermore, the protocol for ammonia microbreakthrough experiments set forth here can be utilized for a variety of test gases and microporous materials. PMID:24145623

MM-wave cyclotron auto-resonance maser for plasma heating

Science.gov (United States)

Ceccuzzi, S.; Dattoli, G.; Di Palma, E.; Doria, A.; Gallerano, G. P.; Giovenale, E.; Mirizzi, F.; Spassovsky, I.; Ravera, G. L.; Surrenti, V.; Tuccillo, A. A.

2014-02-01

Heating and Current Drive systems are of outstanding relevance in fusion plasmas, magnetically confined in tokamak devices, as they provide the tools to reach, sustain and control burning conditions. Heating systems based on the electron cyclotron resonance (ECRH) have been extensively exploited on past and present machines DEMO, and the future reactor will require high frequencies. Therefore, high power (≥1MW) RF sources with output frequency in the 200 - 300 GHz range would be necessary. A promising source is the so called Cyclotron Auto-Resonance Maser (CARM). Preliminary results of the conceptual design of a CARM device for plasma heating, carried out at ENEA-Frascati will be presented together with the planned R&D development.

[INVITED] Recent advances in surface plasmon resonance based fiber optic chemical and biosensors utilizing bulk and nanostructures

Science.gov (United States)

Gupta, Banshi D.; Kant, Ravi

2018-05-01

Surface plasmon resonance has established itself as an immensely acclaimed and influential optical sensing tool with quintessential applications in life sciences, environmental monitoring, clinical diagnostics, pharmaceutical developments and ensuring food safety. The implementation of sensing principle of surface plasmon resonance employing an optical fiber as a substrate has concomitantly resulted in the evolution of fiber optic surface plasmon resonance as an exceptionally lucrative scaffold for chemical and biosensing applications. This perspective article outlines the contemporary studies on fiber optic sensors founded on the sensing architecture of propagating as well as localized surface plasmon resonance. An in-depth review of the prevalent analytical and surface chemical tactics involved in configuring the sensing layer over an optical fiber for the detection of various chemical and biological entities is presented. The involvement of nanomaterials as a strategic approach to enhance the sensor sensitivity is furnished concurrently providing an insight into the diverse geometrical blueprints for designing fiber optic sensing probes. Representative examples from the literature are discussed to appreciate the latest advancements in this potentially valuable research avenue. The article concludes by identifying some of the key challenges and exploring the opportunities for expanding the scope and impact of surface plasmon resonance based fiber optic sensors.

Non-stationarity of resonance signals from magnetospheric and ionospheric plasmas

International Nuclear Information System (INIS)

Higel, Bernard

1975-01-01

Rocket observations of resonance signals from ionospheric plasma were made during EIDI relaxation sounding experiments. It appeared that their amplitude, phase, and frequency characteristics are not stationary as a function of the receipt time. The measurement of these nonstationary signals increases the interest presented by resonance phenomena in spatial plasma diagnostics, but this measurement is not easy for frequency non-stationarities. A new method, entirely numerical, is proposed for automatic recognition of these signals. It will be used for the selecting and real-time processing of signals of the same type to be observed during relaxation sounding experiments on board of the futur GEOS satellite. In this method a statistical discrimination is done on the values taken by several parameters associated with the non-stationarities of the observed resonance signals [fr

Calculation of baryon chemical potential and strangeness chemical potential in resonance matter

International Nuclear Information System (INIS)

Fu Yuanyong; Hu Shouyang; Lu Zhongdao

2006-01-01

Based on the high energy heavy-ion collisions statistical model, the baryon chemical potential and strangeness chemical potential are calculated for resonance matter with net baryon density and net strangeness density under given temperature. Furthermore, the relationship between net baryon density, net strangeness density and baryon chemical potential, strangeness chemical potential are analyzed. The results show that baryon chemical potential and strangeness chemical potential increase with net baryon density and net strangeness density increasing, the change of net baryon density affects baryon chemical potential and strangeness chemical potential more strongly than the change of net strangeness density. (authors)

Resonant charge exchange for H-H+ in Debye plasmas

Science.gov (United States)

Laricchiuta, Annarita; Colonna, Gianpiero; Capitelli, Mario; Kosarim, Alexander; Smirnov, Boris M.

2017-11-01

The dynamics of resonant charge exchange in proton-hydrogen collisions embedded in plasma is investigated in the framework of the asymptotic approach, modified to account for the effect of Debye-Hückel screening in particle interactions. The cross sections exhibit a marked dependence on the Debye length in regimes of severe plasma confinement. Processes involving excited states H( n)-H+ are also discussed.

Isotope separation in plasma by ion-cyclotron resonance method

International Nuclear Information System (INIS)

Dubinov, A.E.; Kornilova, I.Yu.; Selemir, V.D.

2001-01-01

Contemporary state of investigation on isotope separation in plasma using selective ion-cyclotron resonance (ICR) heating is considered. The main attention is paid to necessary conditions of heating selectivity, plasma creation methods in isotope ICR-separation facilities, selection of antenna systems for heating, and principles of more-heated component selection. Experimental results obtained at different isotope mixtures separation are presented [ru

Nonlinear Right-Hand Polarized Wave in Plasma in the Electron Cyclotron Resonance Region

Science.gov (United States)

Krasovitskiy, V. B.; Turikov, V. A.

2018-05-01

The propagation of a nonlinear right-hand polarized wave along an external magnetic field in subcritical plasma in the electron cyclotron resonance region is studied using numerical simulations. It is shown that a small-amplitude plasma wave excited in low-density plasma is unstable against modulation instability with a modulation period equal to the wavelength of the excited wave. The modulation amplitude in this case increases with decreasing detuning from the resonance frequency. The simulations have shown that, for large-amplitude waves of the laser frequency range propagating in plasma in a superstrong magnetic field, the maximum amplitude of the excited longitudinal electric field increases with the increasing external magnetic field and can reach 30% of the initial amplitude of the electric field in the laser wave. In this case, the energy of plasma electrons begins to substantially increase already at magnetic fields significantly lower than the resonance value. The laser energy transferred to plasma electrons in a strong external magnetic field is found to increase severalfold compared to that in isotropic plasma. It is shown that this mechanism of laser radiation absorption depends only slightly on the electron temperature.

An economic analysis of the deposition of electrochromic WO{sub 3} via sputtering or plasma enhanced chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Garg, D. [Air Products and Chemicals Inc., 7201 Hamilton Blvd., Allentown, PA 18195-7201 (United States); Henderson, P.B. [Air Products and Chemicals Inc., 7201 Hamilton Blvd., Allentown, PA 18195-7201 (United States)]. E-mail: henderpb@airproducts.co; Hollingsworth, R.E. [ITN Energy Systems Inc., 8130 Shaffer Pkwy, Littleton, CO 80127 (United States); Jensen, D.G. [ITN Energy Systems Inc., 8130 Shaffer Pkwy, Littleton, CO 80127 (United States)

2005-06-15

The costs of manufacturing electrochromic WO{sub 3} thin films deposited by either radio frequency plasma enhanced chemical vapor deposition (PECVD) or DC reactive magnetron sputtering of metal targets were modeled. Both inline systems for large area glass substrates and roll-to-roll systems for flexible webs were compared. Costs of capital, depreciation, raw materials, labor, power, and other miscellaneous items were accounted for in the model. The results predict that on similar sized systems, PECVD can produce electrochromic WO{sub 3} for as little as one-third the cost, and have more than 10 times the annual production capacity of sputtering. While PECVD cost is dominated by raw materials, primarily WF{sub 6}, sputtering cost is dominated by labor and depreciation.

Combustion flame-plasma hybrid reactor systems, and chemical reactant sources

Science.gov (United States)

Kong, Peter C

2013-11-26

Combustion flame-plasma hybrid reactor systems, chemical reactant sources, and related methods are disclosed. In one embodiment, a combustion flame-plasma hybrid reactor system comprising a reaction chamber, a combustion torch positioned to direct a flame into the reaction chamber, and one or more reactant feed assemblies configured to electrically energize at least one electrically conductive solid reactant structure to form a plasma and feed each electrically conductive solid reactant structure into the plasma to form at least one product is disclosed. In an additional embodiment, a chemical reactant source for a combustion flame-plasma hybrid reactor comprising an elongated electrically conductive reactant structure consisting essentially of at least one chemical reactant is disclosed. In further embodiments, methods of forming a chemical reactant source and methods of chemically converting at least one reactant into at least one product are disclosed.

Monitoring and trace detection of hazardous waste and toxic chemicals using resonance Raman spectroscopy

International Nuclear Information System (INIS)

Sedlacek, A.J. III; Dougherty, D.R.; Chen, C.L.

1993-01-01

Raman scattering is a coherent, inelastic, two-photon process, which shifts the frequency of an outgoing photon according to the vibrational structure of the irradiated species, thereby providing a unique fingerprint of the molecule. When involving an allowed electronic transition (resonance Raman), this scattering cross section can be enhanced by 10 4 to 10 6 and provides the basis for a viable technique that can monitor and detect trace quantities of hazardous wastes and toxic chemicals. Resonance Raman spectroscopy (RRS) possesses many of the ideal characteristics for monitoring and detecting of hazardous waste and toxic chemicals. Some of these traits are: (1) very high selectivity (chemical specific fingerprints); (2) independence from the excitation wavelength (ability to monitor in the solar blind region); (3) chemical mixture fingerprints are the sum of its individual components (no spectral cross-talk); (4) near independence of the Raman fingerprint to its physical state (very similar spectra for gas, liquid, solid and solutions -- either bulk or aerosols); and (5) insensitivity of the Raman signature to environmental conditions (no quenching). Data from a few chemicals will be presented which illustrate these features. In cases where background fluorescence accompanies the Raman signals, an effective frequency modulation technique has been developed, which can completely eliminate this interference

Fast enhancement on hydrophobicity of poplar wood surface using low-pressure dielectric barrier discharges (DBD) plasma

Science.gov (United States)

Chen, Weimin; Zhou, Xiaoyan; Zhang, Xiaotao; Bian, Jie; Shi, Shukai; Nguyen, Thiphuong; Chen, Minzhi; Wan, Jinglin

2017-06-01

The hydrophilicity of woody products leads to deformation and cracks, which greatly limits its applications. Low-pressure dielectric barrier discharge (DBD) plasma using hexamethyldisiloxane was applied in poplar wood surface to enhance the hydrophobicity. The chemical properties, micro-morphology, and contact angles of poplar wood surface before and after plasma treatment were investigated by attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR), x-ray photoelectron spectroscopy (XPS), scanning electron microscope and energy dispersive analysis of X-ray (SEM-EDX), atomic force microscopy (AFM), and optical contact angle measurement (OCA). Moreover, tinfoil film was used as the base to reveal the enhancement mechanism. The results showed that hexamethyldisiloxane monomer is first broken into several fragments with active sites and hydrophobic chemical groups. Meanwhile, plasma treatment results in the formation of free radicals and active sites in the poplar wood surface. Then, the fragments are reacted with free radicals and incorporated into the active sites to form a network structure based on the linkages of Si-O-Si and Sisbnd Osbnd C. Plasma treatment also leads to the formation of acicular nano-structure in poplar wood surface. These facts synergistically enhance the hydrophobicity of poplar wood surface, demonstrating the dramatically increase in the equilibrium contact angle by 330%.

Modification of Plasma Solitons by Resonant Particles

DEFF Research Database (Denmark)

Karpman, Vladimir; Lynov, Jens-Peter; Michelsen, Poul

1980-01-01

A consistent theory of plasma soliton interaction with resonant particles is developed. A simple derivation of a perturbed Korteweg–de Vries equation with the interaction term is presented. It is shown how the known limit cases (such as Ott–Sudan’s, etc.) can be derived from the general equations...... Korteweg–de Vries equation. Laboratory measurements carried out in a strongly magnetized, plasma‐filled waveguide and results from particle simulation are interpreted in terms of the analytical results.......A consistent theory of plasma soliton interaction with resonant particles is developed. A simple derivation of a perturbed Korteweg–de Vries equation with the interaction term is presented. It is shown how the known limit cases (such as Ott–Sudan’s, etc.) can be derived from the general equations...... and what their regions of applicability are. Some effects caused by the soliton‐particle interaction (amplitude change‐rate, tail formation, etc.) are analyzed by means of a recently developed perturbation method. The analytical results are compared with a direct numerical integration of the perturbed...

Plasma production for electron acceleration by resonant plasma wave

International Nuclear Information System (INIS)

Anania, M.P.; Biagioni, A.; Chiadroni, E.; Cianchi, A.; Croia, M.; Curcio, A.; Di Giovenale, D.; Di Pirro, G.P.; Filippi, F.; Ghigo, A.; Lollo, V.; Pella, S.; Pompili, R.; Romeo, S.; Ferrario, M.

2016-01-01

Plasma wakefield acceleration is the most promising acceleration technique known nowadays, able to provide very high accelerating fields (10–100 GV/m), enabling acceleration of electrons to GeV energy in few centimeter. However, the quality of the electron bunches accelerated with this technique is still not comparable with that of conventional accelerators (large energy spread, low repetition rate, and large emittance); radiofrequency-based accelerators, in fact, are limited in accelerating field (10–100 MV/m) requiring therefore hundred of meters of distances to reach the GeV energies, but can provide very bright electron bunches. To combine high brightness electron bunches from conventional accelerators and high accelerating fields reachable with plasmas could be a good compromise allowing to further accelerate high brightness electron bunches coming from LINAC while preserving electron beam quality. Following the idea of plasma wave resonant excitation driven by a train of short bunches, we have started to study the requirements in terms of plasma for SPARC-LAB (Ferrario et al., 2013 [1]). In particular here we focus on hydrogen plasma discharge, and in particular on the theoretical and numerical estimates of the ionization process which are very useful to design the discharge circuit and to evaluate the current needed to be supplied to the gas in order to have full ionization. Eventually, the current supplied to the gas simulated will be compared to that measured experimentally.

Plasma production for electron acceleration by resonant plasma wave

Energy Technology Data Exchange (ETDEWEB)

Anania, M.P., E-mail: maria.pia.anania@lnf.infn.it [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy); Biagioni, A.; Chiadroni, E. [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy); Cianchi, A. [University of Rome Tor Vergata - INFN, via della Ricerca Scientifica, 1, 00133 Roma (Italy); INFN, Via della Ricerca Scientifica, 1, 00133 Roma (Italy); Croia, M.; Curcio, A. [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy); University of Rome La Sapienza, Piazzale Aldo Moro, 2, 00185 Roma (Italy); Di Giovenale, D.; Di Pirro, G.P. [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy); Filippi, F. [University of Rome La Sapienza, Piazzale Aldo Moro, 2, 00185 Roma (Italy); Ghigo, A.; Lollo, V.; Pella, S.; Pompili, R. [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy); Romeo, S. [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy); University of Rome La Sapienza, Piazzale Aldo Moro, 2, 00185 Roma (Italy); Ferrario, M. [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy)

2016-09-01

Plasma wakefield acceleration is the most promising acceleration technique known nowadays, able to provide very high accelerating fields (10–100 GV/m), enabling acceleration of electrons to GeV energy in few centimeter. However, the quality of the electron bunches accelerated with this technique is still not comparable with that of conventional accelerators (large energy spread, low repetition rate, and large emittance); radiofrequency-based accelerators, in fact, are limited in accelerating field (10–100 MV/m) requiring therefore hundred of meters of distances to reach the GeV energies, but can provide very bright electron bunches. To combine high brightness electron bunches from conventional accelerators and high accelerating fields reachable with plasmas could be a good compromise allowing to further accelerate high brightness electron bunches coming from LINAC while preserving electron beam quality. Following the idea of plasma wave resonant excitation driven by a train of short bunches, we have started to study the requirements in terms of plasma for SPARC-LAB (Ferrario et al., 2013 [1]). In particular here we focus on hydrogen plasma discharge, and in particular on the theoretical and numerical estimates of the ionization process which are very useful to design the discharge circuit and to evaluate the current needed to be supplied to the gas in order to have full ionization. Eventually, the current supplied to the gas simulated will be compared to that measured experimentally.

Ti-doped hydrogenated diamond like carbon coating deposited by hybrid physical vapor deposition and plasma enhanced chemical vapor deposition

Science.gov (United States)

Lee, Na Rae; Sle Jun, Yee; Moon, Kyoung Il; Sunyong Lee, Caroline

2017-03-01

Diamond-like carbon films containing titanium and hydrogen (Ti-doped DLC:H) were synthesized using a hybrid technique based on physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD). The film was deposited under a mixture of argon (Ar) and acetylene gas (C2H2). The amount of Ti in the Ti-doped DLC:H film was controlled by varying the DC power of the Ti sputtering target ranging from 0 to 240 W. The composition, microstructure, mechanical and chemical properties of Ti-doped DLC:H films with varying Ti concentrations, were investigated using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), nano indentation, a ball-on-disk tribometer, a four-point probe system and dynamic anodic testing. As a result, the optimum composition of Ti in Ti-doped DLC:H film using our hybrid method was found to be a Ti content of 18 at. %, having superior electrical conductivity and high corrosion resistance, suitable for bipolar plates. Its hardness value was measured to be 25.6 GPa with a low friction factor.

Effects of boron addition on a-Si90Ge10:H films obtained by low frequency plasma enhanced chemical vapour deposition

International Nuclear Information System (INIS)

Perez, Arllene M; Renero, Francisco J; Zuniga, Carlos; Torres, Alfonso; Santiago, Cesar

2005-01-01

Optical, structural and electric properties of (a-(Si 90 Ge 10 ) 1-y B y :H) thin film alloys, deposited by low frequency plasma enhanced chemical vapour deposition, are presented. The chemical bonding structure has been studied by IR spectroscopy, while the composition was investigated by Raman spectroscopy. A discussion about boron doping effects, in the composition and bonding of samples, is presented. Transport of carriers has been studied by measurement of the conductivity dependence on temperature, which increases from 10 -3 to 10 1 Ω -1 cm -1 when the boron content varies from 0 to 50%. Similarly, the activation energy is between 0.62 and 0.19 eV when the doping increases from 0 to 83%. The optical properties have been determined from the film's optical transmission, using Swanepoel's method. It is shown that the optical gap varies from 1.3 to 0.99 eV

Instabilities in strongly coupled plasmas

CERN Document Server

Kalman, G J

2003-01-01

The conventional Vlasov treatment of beam-plasma instabilities is inappropriate when the plasma is strongly coupled. In the strongly coupled liquid state, the strong correlations between the dust grains fundamentally affect the conditions for instability. In the crystalline state, the inherent anisotropy couples the longitudinal and transverse polarizations, and results in unstable excitations in both polarizations. We summarize analyses of resonant and non-resonant, as well as resistive instabilities. We consider both ion-dust streaming and dust beam-plasma instabilities. Strong coupling, in general, leads to an enhancement of the growth rates. In the crystalline phase, a resonant transverse instability can be excited.

Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

International Nuclear Information System (INIS)

Prysiazhnyi, Vadym; Slavicek, Pavel; Klima, Milos; Mikmekova, Eliska

2016-01-01

This paper is aimed to show the influence of initial chemical pretreatment prior to subsequent plasma activation of aluminum surfaces. The results of our study showed that the state of the topmost surface layer (i.e. the surface morphology and chemical groups) of plasma modified aluminum significantly depends on the chemical precleaning. Commonly used chemicals (isopropanol, trichlorethane, solution of NaOH in deionized water) were used as precleaning agents. The plasma treatments were done using a radio frequency driven atmospheric pressure plasma pencil developed at Masaryk University, which operates in Ar, Ar/O 2 gas mixtures. The effectiveness of the plasma treatment was estimated by the wettability measurements, showing high wettability improvement already after 0.3 s treatment. The effects of surface cleaning (hydrocarbon removal), surface oxidation and activation (generation of OH groups) were estimated using infrared spectroscopy. The changes in the surface morphology were measured using scanning electron microscopy. Optical emission spectroscopy measurements in the near-to-surface region with temperature calculations showed that plasma itself depends on the sample precleaning procedure. (paper)

Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

Science.gov (United States)

Vadym, Prysiazhnyi; Pavel, Slavicek; Eliska, Mikmekova; Milos, Klima

2016-04-01

This paper is aimed to show the influence of initial chemical pretreatment prior to subsequent plasma activation of aluminum surfaces. The results of our study showed that the state of the topmost surface layer (i.e. the surface morphology and chemical groups) of plasma modified aluminum significantly depends on the chemical precleaning. Commonly used chemicals (isopropanol, trichlorethane, solution of NaOH in deionized water) were used as precleaning agents. The plasma treatments were done using a radio frequency driven atmospheric pressure plasma pencil developed at Masaryk University, which operates in Ar, Ar/O2 gas mixtures. The effectiveness of the plasma treatment was estimated by the wettability measurements, showing high wettability improvement already after 0.3 s treatment. The effects of surface cleaning (hydrocarbon removal), surface oxidation and activation (generation of OH groups) were estimated using infrared spectroscopy. The changes in the surface morphology were measured using scanning electron microscopy. Optical emission spectroscopy measurements in the near-to-surface region with temperature calculations showed that plasma itself depends on the sample precleaning procedure.

In situ growth rate measurements during plasma-enhanced chemical vapour deposition of vertically aligned multiwall carbon nanotube films

International Nuclear Information System (INIS)

Joensson, M; Nerushev, O A; Campbell, E E B

2007-01-01

In situ laser reflectivity measurements are used to monitor the growth of multiwalled carbon nanotube (MWCNT) films grown by DC plasma-enhanced chemical vapour deposition (PECVD) from an iron catalyst film deposited on a silicon wafer. In contrast to thermal CVD growth, there is no initial increase in the growth rate; instead, the initial growth rate is high (as much as 10 μm min -1 ) and then drops off rapidly to reach a steady level (2 μm min -1 ) for times beyond 1 min. We show that a limiting factor for growing thick films of multiwalled nanotubes (MWNTs) using PECVD can be the formation of an amorphous carbon layer at the top of the growing nanotubes. In situ reflectivity measurements provide a convenient technique for detecting the onset of the growth of this layer

Formation of apatite on hydrogenated amorphous silicon (a-Si:H) film deposited by plasma-enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Liu Xuanyong; Chu, Paul K.; Ding Chuanxian

2007-01-01

Hydrogenated amorphous silicon films were fabricated on p-type, 100 mm diameter silicon wafers by plasma-enhanced chemical vapor deposition (PECVD) using silane and hydrogen. The structure and composition of the hydrogenated amorphous silicon films were investigated using micro-Raman spectroscopy and cross-sectional transmission electron microscopy (XTEM). The hydrogenated amorphous silicon films were subsequently soaked in simulated body fluids to evaluate apatite formation. Carbonate-containing hydroxyapatite (bone-like apatite) was formed on the surface suggesting good bone conductivity. The amorphous structure and presence of surface Si-H bonds are believed to induce apatite formation on the surface of the hydrogenated amorphous silicon film. A good understanding of the surface bioactivity of silicon-based materials and means to produce a bioactive surface is important to the development of silicon-based biosensors and micro-devices that are implanted inside humans

Formation of apatite on hydrogenated amorphous silicon (a-Si:H) film deposited by plasma-enhanced chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Liu Xuanyong [Shanghai Institute of Ceramics, Chinese Academy of Sciences, 1295 Dingxi Road, Shanghai 200050 (China) and Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong (China)]. E-mail: xyliu@mail.sic.ac.cn; Chu, Paul K. [Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong (China)]. E-mail: paul.chu@cityu.edu.hk; Ding Chuanxian [Shanghai Institute of Ceramics, Chinese Academy of Sciences, 1295 Dingxi Road, Shanghai 200050 (China)

2007-01-15

Hydrogenated amorphous silicon films were fabricated on p-type, 100 mm diameter <1 0 0> silicon wafers by plasma-enhanced chemical vapor deposition (PECVD) using silane and hydrogen. The structure and composition of the hydrogenated amorphous silicon films were investigated using micro-Raman spectroscopy and cross-sectional transmission electron microscopy (XTEM). The hydrogenated amorphous silicon films were subsequently soaked in simulated body fluids to evaluate apatite formation. Carbonate-containing hydroxyapatite (bone-like apatite) was formed on the surface suggesting good bone conductivity. The amorphous structure and presence of surface Si-H bonds are believed to induce apatite formation on the surface of the hydrogenated amorphous silicon film. A good understanding of the surface bioactivity of silicon-based materials and means to produce a bioactive surface is important to the development of silicon-based biosensors and micro-devices that are implanted inside humans.

Characterization of diamond-like nanocomposite thin films grown by plasma enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Santra, T. S.; Liu, C. H.; Bhattacharyya, T. K.; Patel, P.; Barik, T. K.

2010-01-01

Diamond-like nanocomposite (DLN) thin films, comprising the networks of a-C:H and a-Si:O were deposited on pyrex glass or silicon substrate using gas precursors (e.g., hexamethyldisilane, hexamethyldisiloxane, hexamethyldisilazane, or their different combinations) mixed with argon gas, by plasma enhanced chemical vapor deposition technique. Surface morphology of DLN films was analyzed by atomic force microscopy. High-resolution transmission electron microscopic result shows that the films contain nanoparticles within the amorphous structure. Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to determine the structural change within the DLN films. The hardness and friction coefficient of the films were measured by nanoindentation and scratch test techniques, respectively. FTIR and XPS studies show the presence of C-C, C-H, Si-C, and Si-H bonds in the a-C:H and a-Si:O networks. Using Raman spectroscopy, we also found that the hardness of the DLN films varies with the intensity ratio I D /I G . Finally, we observed that the DLN films has a better performance compared to DLC, when it comes to properties like high hardness, high modulus of elasticity, low surface roughness and low friction coefficient. These characteristics are the critical components in microelectromechanical systems (MEMS) and emerging nanoelectromechanical systems (NEMS).

Plasma equilibrium profiles with applied resonant fields on TBR-1 tokamak

International Nuclear Information System (INIS)

Castro, R.M. de; Heller, M.V.A.P.; Caldas, I.L.; Silva, R.P. da; Brasilio, Z.A.; Oda, G.A.

1995-01-01

In this work we present the measurements of the plasma potential, in the edge and in the scrape-off layer regions of plasma, with and without the presence of the magnetic field perturbations produced by resonant helical windings. (author). 6 refs., 6 figs

Fundamental aspects of plasma chemical physics Thermodynamics

CERN Document Server

Capitelli, Mario; D'Angola, Antonio

2012-01-01

Fundamental Aspects of Plasma Chemical Physics - Thermodynamics develops basic and advanced concepts of plasma thermodynamics from both classical and statistical points of view. After a refreshment of classical thermodynamics applied to the dissociation and ionization regimes, the book invites the reader to discover the role of electronic excitation in affecting the properties of plasmas, a topic often overlooked by the thermal plasma community. Particular attention is devoted to the problem of the divergence of the partition function of atomic species and the state-to-state approach for calculating the partition function of diatomic and polyatomic molecules. The limit of ideal gas approximation is also discussed, by introducing Debye-Huckel and virial corrections. Throughout the book, worked examples are given in order to clarify concepts and mathematical approaches. This book is a first of a series of three books to be published by the authors on fundamental aspects of plasma chemical physics.  The next bo...

Wave propagation in a quasi-chemical equilibrium plasma

Science.gov (United States)

Fang, T.-M.; Baum, H. R.

1975-01-01

Wave propagation in a quasi-chemical equilibrium plasma is studied. The plasma is infinite and without external fields. The chemical reactions are assumed to result from the ionization and recombination processes. When the gas is near equilibrium, the dominant role describing the evolution of a reacting plasma is played by the global conservation equations. These equations are first derived and then used to study the small amplitude wave motion for a near-equilibrium situation. Nontrivial damping effects have been obtained by including the conduction current terms.

Chemical shift of neutron resonances and some ideas on neutron resonances and scattering theory

International Nuclear Information System (INIS)

Ignatovich, V.K.; )

2002-01-01

The dependence of positions of neutron resonances in nuclei in condensed matter on chemical environment is considered. A possibility of theoretical description of neutron resonances, different from R-matrix theory is investigated. Some contradictions of standard scattering theory are discussed and a new approach without these contradictions is formulated [ru

Electrical transport properties of graphene nanowalls grown at low temperature using plasma enhanced chemical vapor deposition

Science.gov (United States)

Zhao, Rong; Ahktar, Meysam; Alruqi, Adel; Dharmasena, Ruchira; Jasinski, Jacek B.; Thantirige, Rukshan M.; Sumanasekera, Gamini U.

2017-05-01

In this work, we report the electrical transport properties of uniform and vertically oriented graphene (graphene nanowalls) directly synthesized on multiple substrates including glass, Si/SiO2 wafers, and copper foils using radio-frequency plasma enhanced chemical vapor deposition (PECVD) with methane (CH4) as the precursor at relatively low temperatures. The temperature for optimum growth was established with the aid of transmission electron microscopy, scanning electron microscopy, and Raman spectroscopy. This approach offers means for low-cost graphene nanowalls growth on an arbitrary substrate with the added advantage of transfer-free device fabrication. The temperature dependence of the electrical transport properties (resistivity and thermopower) were studied in the temperature range, 30-300 K and analyzed with a combination of 2D-variable range hopping (VRH) and thermally activated (TA) conduction mechanisms. An anomalous temperature dependence of the thermopower was observed for all the samples and explained with a combination of a diffusion term having a linear temperature dependence plus a term with an inverse temperature dependence.

Resonant absorption of radar waves by a magnetized collisional plasma

International Nuclear Information System (INIS)

Sun Aiping; Tong Honghui; Shen Liru; Tang Deli; Qiu Xiaoming

2001-01-01

The propagation of radar waves in a magnetized collisional plasma slab is studied numerically. It is found for uniform plasma that: first, the wave attenuation and absorbed power show a peak value, i.e., resonant absorption when the collision frequency f en = 0.1, 0.5, 1 GHz and the wave frequency nears upper hybrid frequency. Secondly, the attenuation, absorbed, and transmitted power curves become flat at f en = 5, 10 Ghz. thirdly, the attenuation and absorbed power increase with plasma density, and the attenuation and the proportion of absorbed power can reach 100 dB and 80%, respectively, at the plasma density n = 10 11 cm -3 . For nonuniform plasma, the peak value of reflected power is larger than that in uniform plasma. So, uniform magnetized plasma is of more benefit to plasma cloaking

Evaluation of Tumor Angiogenesis Using Dynamic Enhanced Magnetic Resonance Imaging: Comparison of Plasma Vascular Endothelial Growth Factor, Hemodynamic, and Pharmacokinetic Parameters

International Nuclear Information System (INIS)

Ikeda, O.; Nishimura, R.; Miyayama, H.; Yasunaga, T.; Ozaki, Y.; Tuji, A.; Yamashita, Y.

2004-01-01

Purpose: To assess whether tumor angiogenesis of breast cancers can be predicted on the basis of dynamic magnetic resonance imaging (MRI). Material and Methods: Seventy-one patients with 71 breast cancers underwent Gd-DTPA enhanced dynamic MRI. Two regions of interest measurements were obtained in the periphery and in the center of the breast cancers. Hemodynamic parameters obtained by dynamic MRI included peak time, contrast enhancement ratio (CE ratio), and washout ratio. The triexponential concentration curve of Gd-DTPA was fitted to a theoretical model based on compartmental analysis. The transfer constant (or permeability surface product per unit volume of compartment 'k') was obtained using this method. Tumor angiogenesis was assessed by plasma vascular endothelial growth factor (P-VEGF). Results: The P-VEGF was positive in 28 of 71 tumors (39%). The CE ratio, washout ratio, and k in the periphery in P-VEGF positive breast cancers (mean 178%, 18%, and 1.5x10 -2 (s-1)) were significantly greater (P -2 (s-1)). The peak time in the periphery in P-VEGF positive breast cancers was more marked than for P-VEGF negative breast cancers, but this difference was not significant. Conclusion: The hemodynamic and pharmacokinetic analysis of MRI provides valuable information about angiogenesis of breast cancers

Wake-Field Wave Resonant Excitation in Magnetized Plasmas by Electromagnetic Pulse

International Nuclear Information System (INIS)

Milant'ev, V.P.; Turikov, V.A.

2006-01-01

In this paper the space charge wave excitation process at electromagnetic pulse propagation along external magnetic field in vicinity of electron cyclotron resonance. In hydrodynamic approach it is obtained an equation for plasma density under ponderomotive force action. With help of this equation we investigated a wake-field wave amplitude dependence from resonance detuning. The numerical simulation using a PIC method electromagnetic pulse propagation process in the resonant conditions was done

Plasma characterization using terahertz-wave-enhanced fluorescence

International Nuclear Information System (INIS)

Liu Jingle; Zhang, X.-C.

2010-01-01

We demonstrate that the terahertz-wave-enhanced fluorescence emission from excited atoms or molecules can be employed in the characterization of laser-induced gas plasmas. The electron relaxation time and plasma density were deduced through applying the electron impact excitation/ionization and electron-ion recombination processes to the measured time-dependent enhanced fluorescence. The electron collision dynamics of nitrogen plasma excited at different gas pressures and laser pulse energies have been systematically investigated. This plasma characterization method provides picosecond temporal resolution and enables omnidirectional optical signal collection.

Synthesis and analysis of silicon nanowire below Si-Au eutectic temperatures using very high frequency plasma enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Hamidinezhad, Habib; Wahab, Yussof; Othaman, Zulkafli; Ismail, Abd Khamim

2011-01-01

Silicon nanowires (SiNWs) were synthesized from pure silane precursor gas and Au nanoparticles catalyst at below Au-Si eutectic temperature. The SiNWs were grown onto Si (1 1 1) substrates using very high frequency plasma enhanced chemical vapor deposition via a vapor-solid-solid mechanism at temperatures ranging from 363 to 230 deg. C. The morphology of the synthesized SiNWs was characterized by means of field emission scanning electron microscope equipped with energy dispersive X-ray, high resolution transmission electron microscopy, X-ray diffraction technique and Raman spectroscope. Results demonstrated that the SiNWs can be grown at the temperature as low as 250 deg. C. In addition, it was revealed that the grown wires were silicon-crystallized.

Plasma diagnostics using laser-excited coupled and transmission ring resonators

International Nuclear Information System (INIS)

Haas, R.A.

1976-01-01

In this paper a simple two-level laser model is used to investigate the frequency response of coupled-cavity laser interferometers. It is found that under certain circumstances, often satisfied by molecular gas lasers, the frequency response exhibits a resonant behavior. This behavior severely complicates the interpretation of coupled-cavity laser interferometer measurements of rapidly varying plasmas. To circumvent this limitation a new type of laser interferometer plasma diagnostic with significantly improved time response was developed. In this interferometer the plasma is located in one arm of a transmission ring resonator cavity that is excited by an externally positioned laser. Thus, the laser is decoupled from the interferometer cavity and the time response of the interferometer is then limited by the Q of the ring resonator cavity. This improved time response is acquired without loss of spatial resolution, but requires a more sensitive signal detector since the laser is no longer used as a detector as it is in conventional coupled-cavity laser interferometers. Thus, the new technique incorporates the speed of the Mach--Zender interferometer and the sensitivity of the coupled-cavity laser interferometer. The basic operating principles of this type of interferometer have been verified using a CO 2 laser

Proton nuclear magnetic resonance spectroscopy of plasma lipoproteins in malignancy

International Nuclear Information System (INIS)

Nabholtz, J.M.; Rossignol, A.; Farnier, M.; Gambert, P.; Tremeaux, J.C.; Friedman, S.; Guerrin, J.

1988-01-01

A recent study described a method of detecting malignant tumors by water-supressed proton nuclear magnetic resonance (1 H NMR) study of plasma. We performed a similar study of the W 1/2, a mean of the full width at half height of the resonances of the methyl and methylene groups of the lipids of plasma lipoproteins which is inversely related to the spin-spin apparent relaxation time (T 2 * ). W 1/2 values were measured at a fixed baseline width of 310 Hz. The study was prospective and blinded and comprised 182 subjects consisting of 40 controls, 68 patients with untreated malignancies, 45 with malignant tumors undergoing therapy and 29 benign tumor patients. No differences were seen between any groups that could serve as a basis for a useful clinical test. The major difficulty in the determination of W 1/2 was due to interference of metabolite protons (particularly lactate) within the lipoprotein resonance signal. Triglyceride level was seen to correlate inversely with W 1/2 within malignant patient groups. These discrepant results may be related to differing triglyceride-rich very low density lipoprotein (VLDL) levels in the ;atient populations of each study. We conclude that the water-suppressed 1H NMR of plasma lipoproteins is not a valid measurement for assessing malignancy. (orig.)

Resonant Self-Trapping and Absorption of Intense Bessel Beams

International Nuclear Information System (INIS)

Fan, J.; Parra, E.; Milchberg, H. M.

2000-01-01

We report the observation of resonant self-trapping and enhanced laser-plasma heating resulting from propagation of high intensity Bessel beams in neutral gas. The enhancement in absorption and plasma heating is directly correlated to the spatial trapping of laser radiation. (c) 2000 The American Physical Society

Effects of boron addition on a-Si(90)Ge(10):H films obtained by low frequency plasma enhanced chemical vapour deposition.

Science.gov (United States)

Pérez, Arllene M; Renero, Francisco J; Zúñiga, Carlos; Torres, Alfonso; Santiago, César

2005-06-29

Optical, structural and electric properties of (a-(Si(90)Ge(10))(1-y)B(y):H) thin film alloys, deposited by low frequency plasma enhanced chemical vapour deposition, are presented. The chemical bonding structure has been studied by IR spectroscopy, while the composition was investigated by Raman spectroscopy. A discussion about boron doping effects, in the composition and bonding of samples, is presented. Transport of carriers has been studied by measurement of the conductivity dependence on temperature, which increases from 10(-3) to 10(1) Ω(-1) cm(-1) when the boron content varies from 0 to 50%. Similarly, the activation energy is between 0.62 and 0.19 eV when the doping increases from 0 to 83%. The optical properties have been determined from the film's optical transmission, using Swanepoel's method. It is shown that the optical gap varies from 1.3 to 0.99 eV.

Radio-frequency oxygen-plasma-enhanced pulsed laser deposition of IGZO films

Science.gov (United States)

Chou, Chia-Man; Lai, Chih-Chang; Chang, Chih-Wei; Wen, Kai-Shin; Hsiao, Vincent K. S.

2017-07-01

We demonstrate the crystalline structures, optical transmittance, surface and cross-sectional morphologies, chemical compositions, and electrical properties of indium gallium zinc oxide (IGZO)-based thin films deposited on glass and silicon substrates through pulsed laser deposition (PLD) incorporated with radio-frequency (r.f.)-generated oxygen plasma. The plasma-enhanced pulsed laser deposition (PEPLD)-based IGZO thin films exhibited a c-axis-aligned crystalline (CAAC) structure, which was attributed to the increase in Zn-O under high oxygen vapor pressure (150 mTorr). High oxygen vapor pressure (150 mTorr) and low r.f. power (10 W) are the optimal deposition conditions for fabricating IGZO thin films with improved electrical properties.

Enhanced energy storage in chaotic optical resonators

KAUST Repository

Liu, Changxu; Di Falco, Andrea; Molinari, Diego P.; Khan, Yasser; Ooi, Boon S.; Krauss, Thomas F.; Fratalocchi, Andrea

2013-01-01

Chaos is a phenomenon that occurs in many aspects of contemporary science. In classical dynamics, chaos is defined as a hypersensitivity to initial conditions. The presence of chaos is often unwanted, as it introduces unpredictability, which makes it difficult to predict or explain experimental results. Conversely, we demonstrate here how chaos can be used to enhance the ability of an optical resonator to store energy. We combine analytic theory with ab initio simulations and experiments in photonic-crystal resonators to show that a chaotic resonator can store six times more energy than its classical counterpart of the same volume. We explain the observed increase by considering the equipartition of energy among all degrees of freedom of the chaotic resonator (that is, the cavity modes) and discover a convergence of their lifetimes towards a single value. A compelling illustration of the theory is provided by enhanced absorption in deformed polystyrene microspheres. © 2013 Macmillan Publishers Limited. All rights reserved.

Enhanced energy storage in chaotic optical resonators

KAUST Repository

Liu, Changxu

2013-05-05

Chaos is a phenomenon that occurs in many aspects of contemporary science. In classical dynamics, chaos is defined as a hypersensitivity to initial conditions. The presence of chaos is often unwanted, as it introduces unpredictability, which makes it difficult to predict or explain experimental results. Conversely, we demonstrate here how chaos can be used to enhance the ability of an optical resonator to store energy. We combine analytic theory with ab initio simulations and experiments in photonic-crystal resonators to show that a chaotic resonator can store six times more energy than its classical counterpart of the same volume. We explain the observed increase by considering the equipartition of energy among all degrees of freedom of the chaotic resonator (that is, the cavity modes) and discover a convergence of their lifetimes towards a single value. A compelling illustration of the theory is provided by enhanced absorption in deformed polystyrene microspheres. © 2013 Macmillan Publishers Limited. All rights reserved.

Formation of a three-dimensional plasma boundary after decay of the plasma response to resonant magnetic perturbation fields

Science.gov (United States)

Schmitz, O.; Evans, T. E.; Fenstermacher, M. E.; Lanctot, M. J.; Lasnier, C. L.; Mordijck, S.; Moyer, R. A.; Reimerdes, H.; the DIII-D Team

2014-01-01

First time experimental evidence is presented for a direct link between the decay of a n = 3 plasma response and the formation of a three-dimensional (3D) plasma boundary. We inspect a lower single-null L-mode plasma which first reacts at sufficiently high rotation with an ideal resonant screening response to an external toroidal mode number n = 3 resonant magnetic perturbation field. Decay of this response due to reduced bulk plasma rotation changes the plasma state considerably. Signatures such as density pump out and a spin up of the edge rotation—which are usually connected to formation of a stochastic boundary—are detected. Coincident, striation of the divertor single ionized carbon emission and a 3D emission structure in double ionized carbon at the separatrix is seen. The striated C II pattern follows in this stage the perturbed magnetic footprint modelled without a plasma response (vacuum approach). This provides for the first time substantial experimental evidence, that a 3D plasma boundary with direct impact on the divertor particle flux pattern is formed as soon as the internal plasma response decays. The resulting divertor structure follows the vacuum modelled magnetic field topology. However, the inward extension of the perturbed boundary layer can still not directly be determined from these measurements.

Diagnostics of microwave assisted electron cyclotron resonance plasma source for surface modification of nylon 6

Science.gov (United States)

More, Supriya E.; Das, Partha Sarathi; Bansode, Avinash; Dhamale, Gayatri; Ghorui, S.; Bhoraskar, S. V.; Sahasrabudhe, S. N.; Mathe, Vikas L.

2018-01-01

Looking at the increasing scope of plasma processing of materials surface, here we present the development and diagnostics of a microwave assisted Electron Cyclotron Resonance (ECR) plasma system suitable for surface modification of polymers. Prior to the surface-treatment, a detailed diagnostic mapping of the plasma parameters throughout the reactor chamber was carried out by using single and double Langmuir probe measurements in Ar plasma. Conventional analysis of I-V curves as well as the elucidation form of the Electron Energy Distribution Function (EEDF) has become the source of calibration of plasma parameters in the reaction chamber. The high energy tail in the EEDF of electron temperature is seen to extend beyond 60 eV, at much larger distances from the ECR zone. This proves the suitability of the rector for plasma processing, since the electron energy is much beyond the threshold energy of bond breaking in most of the polymers. Nylon 6 is used as a representative candidate for surface processing in the presence of Ar, H2 + N2, and O2 plasma, treated at different locations inside the plasma chamber. In a typical case, the work of adhesion is seen to almost get doubled when treated with oxygen plasma. Morphology of the plasma treated surface and its hydrophilicity are discussed in view of the variation in electron density and electron temperature at these locations. Nano-protrusions arising from plasma treatment are set to be responsible for the hydrophobicity. Chemical sputtering and physical sputtering are seen to influence the surface morphology on account of sufficient electron energies and increased plasma potential.

Plasma-treated polystyrene film that enhances binding efficiency for sensitive and label-free protein biosensing

Energy Technology Data Exchange (ETDEWEB)

Guo, Bihong [National Center for NanoScience and Technology, No. 11 Beiyitiao, Zhongguancun, Beijing 100190 (China); Li, Shaopeng [National Center for NanoScience and Technology, No. 11 Beiyitiao, Zhongguancun, Beijing 100190 (China); Department of Chemistry, Tsinghua University, Beijing 100084 (China); Song, Lusheng [National Center for NanoScience and Technology, No. 11 Beiyitiao, Zhongguancun, Beijing 100190 (China); Yang, Mo; Zhou, Wenfei; Tyagi, Deependra [National Center for NanoScience and Technology, No. 11 Beiyitiao, Zhongguancun, Beijing 100190 (China); University of Chinese Academy of Sciences, Yuquan Rd., 19(A), Beijing 100049 (China); Zhu, Jinsong, E-mail: jizhu88@gmail.com [National Center for NanoScience and Technology, No. 11 Beiyitiao, Zhongguancun, Beijing 100190 (China)

2015-08-01

Highlights: • A simple and robust plasma-treated ultrathin polystyrene film surface was developed for protein biosensing. • The surface was optimized by evaluating up to 120 types of fabrication parameters with high-throughput analytical methods. • The optimized surface showed a 620% improvement of the protein detection signal and 210% protein binding per immobilized protein ligand compared with a self-assembled monolayer surface. - Abstract: A plasma-treated ultrathin polystyrene (PS) film surface was explored as a simple, robust, and low-cost surface chemistry solution for protein biosensing applications. This surface could dramatically improve the binding efficiency of the protein–protein interactions, which is defined as the binding signal per immobilized ligand. The PS-modified protein biosensor was readily fabricated by spin coating and plasma treatment. Various parameters for fabrication, including the concentration of the PS solution, rate of spin coating, and duration of plasma treatment, were systematically optimized based on the improvement of fluorescence signal yielded by the microfluidic network-aided fluorescence immunoassay. The performance of the label-free protein detection on the optimized surfaces was further evaluated by surface plasmon resonance imaging (SPRi). PS surfaces with optimal fabrication parameters exhibited up to an 620% enhancement of the protein binding response and approximately 210% of the protein binding per immobilized protein ligand compared with a self-assembled monolayer (SAM) surface of 11-mercapto undecanoic acid (MUA). The relationship between the fabrication parameters used and changes to the surface chemistry and the morphological properties were characterized with atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and Fourier transform infrared spectroscopy (FTIR). It was revealed that the morphological changes observed in the plasma-treated PS film were the dominant factor for the

Effects of the gate dielectric on the subthreshold transport of carbon nanotube network transistors grown by using plasma-enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Jeong, Seung Geun; Park, Wan Jun

2010-01-01

In this study, we investigated the subthreshold slope of random network carbon nanotube transistors with different geometries and passivations. Single-wall carbon nanotubes with lengths of 1-2 m were grown by using plasma-enhanced chemical vapor deposition to form the transistor channels. A critical channel length, where the subthreshold slope was saturated, of 7 μm was obtained. This was due to the percolational behavior of the nanotube random networks. With the dielectric passivation, the subthreshold slope was dramatically reduced from 9 V/decade to 0.9 V/decade by reducing interfacial trap sites, which then reduced the interface capacitance between the nanotube network and the gate dielectric.

Acoustic Resonance Spectroscopy (ARS) Munition Classification System enhancements. Final report

Energy Technology Data Exchange (ETDEWEB)

Vela, O.A.; Huggard, J.C.

1997-09-18

Acoustic Resonance Spectroscopy (ARS) is a non-destructive evaluation technology developed at the Los Alamos National Laboratory (LANL). This technology has resulted in three generations of instrumentation, funded by the Defense Special Weapons Agency (DSWA), specifically designed for field identification of chemical weapon (CW) munitions. Each generation of ARS instrumentation was developed with a specific user in mind. The ARS1OO was built for use by the U.N. Inspection Teams going into Iraq immediately after the Persian Gulf War. The ARS200 was built for use in the US-Russia Bilateral Chemical Weapons Treaty (the primary users for this system are the US Onsite Inspection Agency (OSIA) and their Russian counterparts). The ARS300 was built with the requirements of the Organization for the Prohibition of Chemical Weapons (OPCW) in mind. Each successive system is an improved version of the previous system based on learning the weaknesses of each and, coincidentally, on the fact that more time was available to do a requirements analysis and the necessary engineering development. The ARS300 is at a level of development that warrants transferring the technology to a commercial vendor. Since LANL will supply the computer software to the selected vendor, it is possible for LANL to continue to improve the decision algorithms, add features where necessary, and adjust the user interface before the final transfer occurs. This paper describes the current system, ARS system enhancements, and software enhancements. Appendices contain the Operations Manual (software Version 3.01), and two earlier reports on enhancements.

Characterization of diamond-like nanocomposite thin films grown by plasma enhanced chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Santra, T S; Liu, C H [Institute of Nanoengineering and Microsystems (NEMS), National Tsing Hua University, Hsinchu, Taiwan 30043 (China); Bhattacharyya, T K [Department of Electronics and Electrical Communication Engineering, Indian Institute of Technology, Kharagpur 721302, West Bengal (India); Patel, P [Department of Electrical and Computer Engineering, University of Illinois at Urbana Champaign, Urbana, Illinois 61801 (United States); Barik, T K [School of Applied Sciences, Haldia Institute of Technology, Haldia 721657, Purba Medinipur, West Bengal (India)

2010-06-15

Diamond-like nanocomposite (DLN) thin films, comprising the networks of a-C:H and a-Si:O were deposited on pyrex glass or silicon substrate using gas precursors (e.g., hexamethyldisilane, hexamethyldisiloxane, hexamethyldisilazane, or their different combinations) mixed with argon gas, by plasma enhanced chemical vapor deposition technique. Surface morphology of DLN films was analyzed by atomic force microscopy. High-resolution transmission electron microscopic result shows that the films contain nanoparticles within the amorphous structure. Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to determine the structural change within the DLN films. The hardness and friction coefficient of the films were measured by nanoindentation and scratch test techniques, respectively. FTIR and XPS studies show the presence of C-C, C-H, Si-C, and Si-H bonds in the a-C:H and a-Si:O networks. Using Raman spectroscopy, we also found that the hardness of the DLN films varies with the intensity ratio I{sub D}/I{sub G}. Finally, we observed that the DLN films has a better performance compared to DLC, when it comes to properties like high hardness, high modulus of elasticity, low surface roughness and low friction coefficient. These characteristics are the critical components in microelectromechanical systems (MEMS) and emerging nanoelectromechanical systems (NEMS).

Strangeness Production in a Chemically Equilibrating Quark-Gluon Plasma

Institute of Scientific and Technical Information of China (English)

HE Ze-Jun; LONG Jia-Li; MA Yu-Gang; MA Guo-Liang

2004-01-01

@@ We study the strangeness of a chemically equilibrating quark-gluon plasma at finite baryon density based on the and will accelerate with the change of the initial system from a chemically non-equilibrated to an equilibrated system. We also find that the calculated strangeness is very different from the one in the thermodynamic equilibrium system. This study may be helpful to understand the formation of quark-gluon plasma via a chemically non-equilibrated evolution framework.

Application of acoustic micro-resonators in quartz-enhanced photoacoustic spectroscopy for trace gas analysis

Science.gov (United States)

Zheng, Huadan; Dong, Lei; Wu, Hongpeng; Yin, Xukun; Xiao, Liantuan; Jia, Suotang; Curl, Robert F.; Tittel, Frank K.

2018-01-01

During the past 15 years since the first report of quartz enhanced photoacoustic spectroscopy (QEPAS), QEPAS has become one of the leading optical techniques for trace chemical gas sensing. This paper is a review of the current state-of-the art of QEPAS. QEPAS based spectrophones with different acoustic micro-resonators (AmR) configurations employing both standard quartz tuning forks (QTFs) and custom-made QTFs are summarized and discussed in detail.

Enhanced THz extinction in arrays of resonant semiconductor particles.

Science.gov (United States)

Schaafsma, Martijn C; Georgiou, Giorgos; Rivas, Jaime Gómez

2015-09-21

We demonstrate experimentally the enhanced THz extinction by periodic arrays of resonant semiconductor particles. This phenomenon is explained in terms of the radiative coupling of localized resonances with diffractive orders in the plane of the array (Rayleigh anomalies). The experimental results are described by numerical calculations using a coupled dipole model and by Finite-Difference in Time-Domain simulations. An optimum particle size for enhancing the extinction efficiency of the array is found. This optimum is determined by the frequency detuning between the localized resonances in the individual particles and the Rayleigh anomaly. The extinction calculations and measurements are also compared to near-field simulations illustrating the optimum particle size for the enhancement of the near-field.

Experiments on resonator concept of plasma wakefield accelerator driven by a train of relativistic electron bunches

International Nuclear Information System (INIS)

Kiselev, V.A.; Linnik, A.F.; Mirny, V. I; Onishchenko, I.N.; Uskov, V.V.

2008-01-01

The experimental installation was elaborated to increase plasma wakefield amplitude by means of using plasma resonator that allows all bunches of the train to participate in wakefield build-up contrary to waveguide case, in which due to group velocity effect only a part of the bunches participates. Experiments on plasma producing with resonant density, at which a coincidence of the plasma frequency and bunch repetition frequency is provided, are carried out. The first results of the measurements of beam energy loss on plasma wakefield excitation and energy gain by accelerated electrons are presented

Enhanced self-magnetic field by atomic polarization in partially stripped plasma produced by a short and intense laser pulse

International Nuclear Information System (INIS)

Hu Qianglin; Liu Shibing; Jiang, Y.J.; Zhang Jie

2005-01-01

The enhancement and redistribution of a self-generated quasistatic magnetic field, due to the presence of the polarization field induced by partially ionized atoms, are analytically revealed when a linearly polarized intense and short pulse laser propagates in a partially stripped plasma with higher density. In particular, the shorter wavelength of the laser pulse can evidently intensify the amplitude of the magnetic field. These enhancement and redistribution of the magnetic field are considered physically as a result of the competition of the electrostatic field (electron-ion separation) associated with the plasma wave, the atomic polarization field, and the pondoromotive potential associated with the laser field. This competition leads to the generation of a positive, large amplitude magnetic field in the zone of the pulse center, which forms a significant difference in partially and fully stripped plasmas. The numerical result shows further that the magnetic field is resonantly modulated by the plasma wave when the pulse length is the integer times the plasma wavelength. This apparently implies that the further enhancement and restructure of the large amplitude self-magnetic field can evidently impede the acceleration and stable transfer of the hot-electron beam

Integrated optics ring-resonator chemical sensor with polymer transduction layer

Science.gov (United States)

Ksendzov, A.; Homer, M. L.; Manfreda, A. M.

2004-01-01

An integrated optics chemical sensor based on a ring resonator with an ethyl cellulose polymer coating has been demonstrated. The measured sensitivity to isopropanol in air is 50 ppm-the level immediately useful for health-related air quality monitoring. The resonator was fabricated using SiO2 and SixNy materials. The signal readout is based on tracking the wavelength of a resonance peak. The resonator layout optimisation for sensing applications is discussed.

Formation and characterization of the MgO protecting layer deposited by plasma-enhanced metal-organic chemical-vapor deposition

CERN Document Server

Kang, M S; Byun, J C; Kim, D S; Choi, C K; Lee, J Y; Kim, K H

1999-01-01

MgO films were prepared on Si(100) and soda-lime glass substrates by using plasma-enhanced metal-organic chemical-vapor deposition. Various ratios of the O sub 2 /CH sub 3 MgO sup t Bu gas mixture and various gas flow rates were tested for the film fabrications. Highly (100)-oriented MgO films with good crystallinity were obtained with a 10 sccm CH sub 3 MgO sup t Bu flow without an O sub 2 gas flow. About 5 % carbon was contained in all the MgO films. The refractive index and the secondary electron emission coefficient for the best quality film were 1.43 and 0.45, respectively. The sputtering rate was about 0.2 nm/min for 10 sup 1 sup 1 cm sup - sup 3 Ar sup + ion density. Annealing at 500 .deg. C in an Ar ambient promoted the grain size without inducing a phase transition.

Radio-frequency oxygen-plasma-enhanced pulsed laser deposition of IGZO films

Directory of Open Access Journals (Sweden)

Chia-Man Chou

2017-07-01

Full Text Available We demonstrate the crystalline structures, optical transmittance, surface and cross-sectional morphologies, chemical compositions, and electrical properties of indium gallium zinc oxide (IGZO-based thin films deposited on glass and silicon substrates through pulsed laser deposition (PLD incorporated with radio-frequency (r.f.-generated oxygen plasma. The plasma-enhanced pulsed laser deposition (PEPLD-based IGZO thin films exhibited a c-axis-aligned crystalline (CAAC structure, which was attributed to the increase in Zn-O under high oxygen vapor pressure (150 mTorr. High oxygen vapor pressure (150 mTorr and low r.f. power (10 W are the optimal deposition conditions for fabricating IGZO thin films with improved electrical properties.

Mode converter for electron cyclotron resonance heating of toroidal plasmas

International Nuclear Information System (INIS)

Motley, R.W.; Hsuan, H.; Glanz, J.

1980-09-01

A method is proposed for improving the efficiency of cyclotron resonance heating of a toroidal plasma by ordinary mode radiation from the outside of the torus. Radiation not absorbed in the first pass is reflected from the inside of the torus by a corrugated surface which rotates the polarization by 90 0 , so that a secondary source of extraordinary waves is created in the high field, accessible region of the plasma

Magneto-acoustic resonance in a non-uniform current carrying plasma column

OpenAIRE

Vaclavik, J.

2017-01-01

The forced radial magneto-acoustic oscillations in a plasma column with nonuniform mass density and temperature are investigated. It turns out that the oscillations have a resonant character similar to that of the magneto-acoustic oscillations in a uniform plasma column. The properties of the axial and azimuthal components of the oscillating magnetic field are discussed in detail

Enhanced field emission characteristics of boron doped diamond films grown by microwave plasma assisted chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Koinkar, Pankaj M. [Center for International Cooperation in Engineering Education (CICEE), University of Tokushima, 2-1 Minami-josanjima-cho, Tokushima 770-8506 (Japan); Patil, Sandip S. [Center for Advanced Studies in Materials Science and Condensed Matter Physics, Department of Physics, University of Pune, Pune 411007 (India); Kim, Tae-Gyu [Department of Nano System and Process Engineering, Pusan National University, 50 Cheonghak-ri, Samrangjin-eup, Miryang, Gyeongnam, Pusan 627-706 (Korea, Republic of); Yonekura, Daisuke [Department of Mechanical Engineering, University of Tokushima, 2-1 Minami-josanjima-cho, Tokushima 770-8506 (Japan); More, Mahendra A., E-mail: mam@physics.unipune.ac.in [Center for Advanced Studies in Materials Science and Condensed Matter Physics, Department of Physics, University of Pune, Pune 411007 (India); Joag, Dilip S. [Center for Advanced Studies in Materials Science and Condensed Matter Physics, Department of Physics, University of Pune, Pune 411007 (India); Murakami, Ri-ichi, E-mail: murakami@me.tokushima-u.ac.jp [Department of Mechanical Engineering, University of Tokushima, 2-1 Minami-josanjima-cho, Tokushima 770-8506 (Japan)

2011-01-01

Boron doped diamond films were synthesized on silicon substrates by microwave plasma chemical vapor deposition (MPCVD) technique. The effect of B{sub 2}O{sub 3} concentration varied from 1000 to 5000 ppm on the field emission characteristics was examined. The surface morphology and quality of films were characterized by scanning electron microscope (SEM) and Raman spectroscopy. The surface morphology obtained by SEM showed variation from facetted microcrystal covered with nanometric grains to cauliflower of nanocrystalline diamond (NCD) particles with increasing B{sub 2}O{sub 3} concentration. The Raman spectra confirm the formation of NCD films. The field emission properties of NCD films were observed to improve upon increasing boron concentration. The values of the onset field and threshold field are observed to be as low as 0.36 and 0.08 V/{mu}m, respectively. The field emission current stability investigated at the preset value of {approx}1 {mu}A is observed to be good, in each case. The enhanced field emission properties are attributed to the better electrical conductivity coupled with the nanometric features of the diamond films.

Enhanced laser beam coupling to a plasma

International Nuclear Information System (INIS)

Steiger, A.D.; Woods, C.H.

1976-01-01

Density perturbations are induced in a heated plasma by means of a pair of oppositely directed, polarized laser beams of the same frequency. The wavelength of the density perturbations is equal to one half the wavelength of the laser beams. A third laser beam is linearly polarized and directed at the perturbed plasma along a line that is perpendicular to the direction of the two opposed beams. The electric field of the third beam is oriented to lie in the plane containing the three beams. The frequency of the third beam is chosen to cause it to interact resonantly with the plasma density perturbations, thereby efficiently coupling the energy of the third beam to the plasma. 10 claims, 2 figures

Resonance-enhanced optical forces between coupled photonic crystal slabs.

Science.gov (United States)

Liu, Victor; Povinelli, Michelle; Fan, Shanhui

2009-11-23

The behaviors of lateral and normal optical forces between coupled photonic crystal slabs are analyzed. We show that the optical force is periodic with displacement, resulting in stable and unstable equilibrium positions. Moreover, the forces are strongly enhanced by guided resonances of the coupled slabs. Such enhancement is particularly prominent near dark states of the system, and the enhancement effect is strongly dependent on the types of guided resonances involved. These structures lead to enhancement of light-induced pressure over larger areas, in a configuration that is directly accessible to externally incident, free-space optical beams.

A Method to Construct Plasma with Nonlinear Density Enhancement Effect in Multiple Internal Inductively Coupled Plasmas

International Nuclear Information System (INIS)

Chen Zhipeng; Li Hong; Liu Qiuyan; Luo Chen; Xie Jinlin; Liu Wandong

2011-01-01

A method is proposed to built up plasma based on a nonlinear enhancement phenomenon of plasma density with discharge by multiple internal antennas simultaneously. It turns out that the plasma density under multiple sources is higher than the linear summation of the density under each source. This effect is helpful to reduce the fast exponential decay of plasma density in single internal inductively coupled plasma source and generating a larger-area plasma with multiple internal inductively coupled plasma sources. After a careful study on the balance between the enhancement and the decay of plasma density in experiments, a plasma is built up by four sources, which proves the feasibility of this method. According to the method, more sources and more intensive enhancement effect can be employed to further build up a high-density, large-area plasma for different applications. (low temperature plasma)

Characterization of thin TiO2 films prepared by plasma enhanced chemical vapour deposition for optical and photocatalytic applications

International Nuclear Information System (INIS)

Sobczyk-Guzenda, A.; Gazicki-Lipman, M.; Szymanowski, H.; Kowalski, J.; Wojciechowski, P.; Halamus, T.; Tracz, A.

2009-01-01

Thin titanium oxide films were deposited using a radio frequency (RF) plasma enhanced chemical vapour deposition method. Their optical properties and thickness were determined by means of ultraviolet-visible absorption spectrophotometry. Films of the optical parameters very close to those of titanium dioxide have been obtained at the high RF power input. Their optical quality is high enough to allow for their use in a construction of stack interference optical filters. At the same time, these materials exhibit strong photocatalytic effects. The results of structural analysis, carried out by Raman Shift Spectroscopy, show that the coatings posses amorphous structure. However, Raman spectra of the same films subjected to thermal annealing at 450 o C disclose an appearance of a crystalline form, namely that of anatase. Surface morphology of the films has also been characterized by Atomic Force Microscopy revealing granular, broccoli-like topography of the films.

Transport properties of field effect transistors with randomly networked single walled carbon nanotubes grown by plasma enhanced chemical vapour deposition

International Nuclear Information System (INIS)

Kim, Un Jeong; Park, Wanjun

2009-01-01

The transport properties of randomly networked single walled carbon nanotube (SWNT) transistors with different channel lengths of L c = 2-10 μm were investigated. Randomly networked SWNTs were directly grown for the two different densities of ρ ∼ 25 μm -2 and ρ ∼ 50 μm -2 by water plasma enhanced chemical vapour deposition. The field effect transport is governed mainly by formation of the current paths that is related to the nanotube density. On the other hand, the off-state conductivity deviates from linear dependence for both nanotube density and channel length. The field effect mobility of holes is estimated as 4-13 cm 2 V -1 s -1 for the nanotube transistors based on the simple MOS theory. The mobility is increased for the higher density without meaningful dependence on the channel lengths.

Threshold enhancement of diphoton resonances

CERN Document Server

Bharucha, Aoife; Goudelis, Andreas

2016-10-10

The data collected by the LHC collaborations at an energy of 13 TeV indicates the presence of an excess in the diphoton spectrum that would correspond to a resonance of a 750 GeV mass. The apparently large production cross section is nevertheless very difficult to explain in minimal models. We consider the possibility that the resonance is a pseudoscalar boson $A$ with a two--photon decay mediated by a charged and uncolored fermion having a mass at the $\\frac12 M_A$ threshold and a very small decay width, $\\ll 1$ MeV; one can then generate a large enhancement of the $A\\gamma\\gamma$ amplitude which explains the excess without invoking a large multiplicity of particles propagating in the loop, large electric charges and/or very strong Yukawa couplings. The implications of such a threshold enhancement are discussed in two explicit scenarios: i) the Minimal Supersymmetric Standard Model in which the $A$ state is produced via the top quark mediated gluon fusion process and decays into photons predominantly through...

Enhanced surface functionality via plasma modification and plasma deposition techniques to create more biologically relevant materials

Science.gov (United States)

Shearer, Jeffrey C.

Functionalizing nanoparticles and other unusually shaped substrates to create more biologically relevant materials has become central to a wide range of research programs. One of the primary challenges in this field is creating highly functionalized surfaces without modifying the underlying bulk material. Traditional wet chemistry techniques utilize thin film depositions to functionalize nanomaterials with oxygen and nitrogen containing functional groups, such as --OH and --NHx. These functional groups can serve to create surfaces that are amenable to cell adhesion or can act as reactive groups for further attachment of larger structures, such as macromolecules or antiviral agents. Additional layers, such as SiO2, are often added between the nanomaterial and the functionalized coating to act as a barrier films, adhesion layers, and to increase overall hydrophilicity. However, some wet chemistry techniques can damage the bulk material during processing. This dissertation examines the use of plasma processing as an alternative method for producing these highly functionalized surfaces on nanoparticles and polymeric scaffolds through the use of plasma modification and plasma enhanced chemical vapor deposition techniques. Specifically, this dissertation will focus on (1) plasma deposition of SiO2 barrier films on nanoparticle substrates; (2) surface functionalization of amine and alcohol groups through (a) plasma co-polymerization and (b) plasma modification; and (3) the design and construction of plasma hardware to facilitate plasma processing of nanoparticles and polymeric scaffolds. The body of work presented herein first examines the fabrication of composite nanoparticles by plasma processing. SiOxC y and hexylamine films were coated onto TiO2 nanoparticles to demonstrate enhanced water dispersion properties. Continuous wave and pulsed allyl alcohol plasmas were used to produce highly functionalized Fe2 O3 supported nanoparticles. Specifically, film composition was

Morphological and optical properties changes in nanocrystalline Si (nc-Si) deposited on porous aluminum nanostructures by plasma enhanced chemical vapor deposition for Solar energy applications

Energy Technology Data Exchange (ETDEWEB)

Ghrib, M., E-mail: mondherghrib@yahoo.fr [Laboratoire de Photovoltaique (L.P.V.), Centre de Recherche et des Technologies de l' Energie, BP 95, Hammam-Lif 2050 (Tunisia); Gaidi, M.; Ghrib, T.; Khedher, N. [Laboratoire de Photovoltaique (L.P.V.), Centre de Recherche et des Technologies de l' Energie, BP 95, Hammam-Lif 2050 (Tunisia); Ben Salam, M. [L3M, Department of Physics, Faculty of Sciences of Bizerte, 7021 Zarzouna (Tunisia); Ezzaouia, H. [Laboratoire de Photovoltaique (L.P.V.), Centre de Recherche et des Technologies de l' Energie, BP 95, Hammam-Lif 2050 (Tunisia)

2011-08-15

Photoluminescence (PL) spectroscopy was used to determine the electrical band gap of nanocrystalline silicon (nc-Si) deposited by plasma enhancement chemical vapor deposition (PECVD) on porous alumina structure by fitting the experimental spectra using a model based on the quantum confinement of electrons in Si nanocrystallites having spherical and cylindrical forms. This model permits to correlate the PL spectra to the microstructure of the porous aluminum silicon layer (PASL) structure. The microstructure of aluminum surface layer and nc-Si films was systematically studied by atomic force microscopy (AFM), transmission electron microscopy (TEM), Raman spectroscopy and X-ray diffraction (XRD). It was found that the structure of the nanocrystalline silicon layer (NSL) is dependent of the porosity (void) of the porous alumina layer (PAL) substrate. This structure was performed in two steps, namely the PAL substrate was prepared using sulfuric acid solution attack on an Al foil and then the silicon was deposited by plasma enhanced chemical vapor deposition (PECVD) on it. The optical constants (n and k as a function of wavelength) of the deposited films were obtained using variable angle spectroscopic ellipsometry (SE) in the UV-vis-NIR regions. The SE spectrum of the porous aluminum silicon layer (PASL) was modeled as a mixture of void, crystalline silicon and aluminum using the Cauchy model approximation. The specific surface area (SSA) was estimated and was found to decrease linearly when porosity increases. Based on this full characterization, it is demonstrated that the optical characteristics of the films are directly correlated to their micro-structural properties.

Morphological and optical properties changes in nanocrystalline Si (nc-Si) deposited on porous aluminum nanostructures by plasma enhanced chemical vapor deposition for Solar energy applications

International Nuclear Information System (INIS)

Ghrib, M.; Gaidi, M.; Ghrib, T.; Khedher, N.; Ben Salam, M.; Ezzaouia, H.

2011-01-01

Photoluminescence (PL) spectroscopy was used to determine the electrical band gap of nanocrystalline silicon (nc-Si) deposited by plasma enhancement chemical vapor deposition (PECVD) on porous alumina structure by fitting the experimental spectra using a model based on the quantum confinement of electrons in Si nanocrystallites having spherical and cylindrical forms. This model permits to correlate the PL spectra to the microstructure of the porous aluminum silicon layer (PASL) structure. The microstructure of aluminum surface layer and nc-Si films was systematically studied by atomic force microscopy (AFM), transmission electron microscopy (TEM), Raman spectroscopy and X-ray diffraction (XRD). It was found that the structure of the nanocrystalline silicon layer (NSL) is dependent of the porosity (void) of the porous alumina layer (PAL) substrate. This structure was performed in two steps, namely the PAL substrate was prepared using sulfuric acid solution attack on an Al foil and then the silicon was deposited by plasma enhanced chemical vapor deposition (PECVD) on it. The optical constants (n and k as a function of wavelength) of the deposited films were obtained using variable angle spectroscopic ellipsometry (SE) in the UV-vis-NIR regions. The SE spectrum of the porous aluminum silicon layer (PASL) was modeled as a mixture of void, crystalline silicon and aluminum using the Cauchy model approximation. The specific surface area (SSA) was estimated and was found to decrease linearly when porosity increases. Based on this full characterization, it is demonstrated that the optical characteristics of the films are directly correlated to their micro-structural properties.

Doubly excited 2s2p 1,3Po resonance states of helium in dense plasmas

International Nuclear Information System (INIS)

Kar, Sabyasachi; Ho, Y.K.

2005-01-01

We have made an investigation on the 2s2p 1,3 P o resonance states of helium embedded in dense plasma environments. A screened Coulomb potential obtained from the Debye model is used to represent the interaction between the charge particles. A correlated wave function consisting of a generalized exponential expansion has been used to represent the correlation effect. Resonance energies and widths for the doubly excited He embedded in plasmas with various Debye lengths are determined using the stabilization method by calculating the density of resonance states. The resonance energies and widths for various Debye parameters ranging from infinity to a small value for the lowest 1,3 P o resonance states are reported

Metal/Carbon Hybrid Nanostructures Produced from Plasma-Enhanced Chemical Vapor Deposition over Nafion-Supported Electrochemically Deposited Cobalt Nanoparticles

Directory of Open Access Journals (Sweden)

Mohammad Islam

2018-04-01

Full Text Available In this work, we report development of hybrid nanostructures of metal nanoparticles (NP and carbon nanostructures with strong potential for catalysis, sensing, and energy applications. First, the etched silicon wafer substrates were passivated for subsequent electrochemical (EC processing through grafting of nitro phenyl groups using para-nitrobenzene diazonium (PNBT. The X-ray photoelectron spectroscope (XPS and atomic force microscope (AFM studies confirmed presence of few layers. Cobalt-based nanoparticles were produced over dip or spin coated Nafion films under different EC reduction conditions, namely CoSO4 salt concentration (0.1 M, 1 mM, reduction time (5, 20 s, and indirect or direct EC reduction route. Extensive AFM examination revealed NP formation with different attributes (size, distribution depending on electrochemistry conditions. While relatively large NP with >100 nm size and bimodal distribution were obtained after 20 s EC reduction in H3BO3 following Co2+ ion uptake, ultrafine NP (<10 nm could be produced from EC reduction in CoSO4 and H3BO3 mixed solution with some tendency to form oxides. Different carbon nanostructures including few-walled or multiwalled carbon nanotubes (CNT and carbon nanosheets were grown in a C2H2/NH3 plasma using the plasma-enhanced chemical vapor deposition technique. The devised processing routes enable size controlled synthesis of cobalt nanoparticles and metal/carbon hybrid nanostructures with unique microstructural features.

Maintenance of the resonance in a cavity filled with a variable density plasma; Entretien de la resonance d'une cavite chargee par un plasma de densite variable

Energy Technology Data Exchange (ETDEWEB)

Melin, G [Commissariat a l' Energie Atomique, Saclay (France). Centre d' Etudes Nucleaires

1969-07-01

A study has been made of the possibility of keeping in resonance a cavity filled with a plasma of variable density; only the low HF power zone has been examined (less than a few dozen W). A calculation is first made, for the chosen experimental conditions, of the slipping of the resonance frequency of a cavity as a function of the plasma parameters (density, temperature), with a view to obtaining an idea of its importance. A description is then given of the experimental set-up: the S band cavity (3000 Mc/sec) is supplied by a carcinotron type generator; use is made of the plasma of a positive column whose density ({approx}10{sup 11} cm{sup -3}) can easily be controlled so as to obtain slipping of the cavity frequency ({delta}F{sub max} {approx} 50 Mc/s). The zone of automatic agreement thus obtained for the S band is 3 per cent continuously ({approx}100 Mc/s) and 1 per cent ({approx}30 Mc/s) with a response time of 10 {mu}s (sudden changes in density, {delta}n {approx} 5.10{sup 10} cm{sup 3}). These characteristics already compare very favorably with existing systems, and can easily be improved. (author) [French] On etudie une possibilite de maintenir a la resonance une cavite chargee par un plasma dont la densite varie; on se limite au domaine des puissances HF faibles (< quelques dizaines de W). On calcule tout d'abord, pour les conditions experimentales choisies, le glissement de la frequence de resonance d'une cavite en fonction des parametres du plasma, densite, temperature, pour en evaluer les ordres de grandeur. On decrit ensuite la realisation experimentale: la cavite bande S (3000 Mc/s) est alimentee par un generateur du type carcinotron; on utilise le plasma d'une colonne positive, dont on controle facilement la densite ({approx}10{sup 11} cm{sup -3}) pour faire glisser en frequence la cavite ({delta}F{sub max} {approx} 50 Mc/s). La zone d'accord automatique obtenue ainsi pour la bande S est de 3 pour cent en continu ({approx}100 Mc/s), de 1 pour cent

Atomic force microscopy indentation of fluorocarbon thin films fabricated by plasma enhanced chemical deposition at low radio frequency power

International Nuclear Information System (INIS)

Sirghi, L.; Ruiz, A.; Colpo, P.; Rossi, F.

2009-01-01

Atomic force microscopy (AFM) indentation technique is used for characterization of mechanical properties of fluorocarbon (CF x ) thin films obtained from C 4 F 8 gas by plasma enhanced chemical vapour deposition at low r.f. power (5-30 W) and d.c. bias potential (10-80 V). This particular deposition method renders films with good hydrophobic property and high plastic compliance. Commercially available AFM probes with stiff cantilevers (10-20 N/m) and silicon sharpened tips (tip radius < 10 nm) are used for indentations and imaging of the resulted indentation imprints. Force depth curves and imprint characteristics are used for determination of film hardness, elasticity modulus and plasticity index. The measurements show that the decrease of the discharge power results in deposition of films with decreased hardness and stiffness and increased plasticity index. Nanolithography based on AFM indentation is demonstrated on thin films (thickness of 40 nm) with good plastic compliance.

Trampoline metamaterial: Local resonance enhancement by springboards

Science.gov (United States)

Bilal, Osama R.; Hussein, Mahmoud I.

2013-09-01

We investigate the dispersion characteristics of locally resonant elastic metamaterials formed by the erection of pillars on the solid regions in a plate patterned by a periodic array of holes. We show that these solid regions effectively act as springboards leading to an enhanced resonance behavior by the pillars when compared to the nominal case of pillars with no holes. This local resonance amplification phenomenon, which we define as the trampoline effect, is shown to cause subwavelength bandgaps to increase in size by up to a factor of 4. This outcome facilitates the utilization of subwavelength metamaterial properties over exceedingly broad frequency ranges.

Tensile test of a silicon microstructure fully coated with submicrometer-thick diamond like carbon film using plasma enhanced chemical vapor deposition method

Science.gov (United States)

Zhang, Wenlei; Uesugi, Akio; Hirai, Yoshikazu; Tsuchiya, Toshiyuki; Tabata, Osamu

2017-06-01

This paper reports the tensile properties of single-crystal silicon (SCS) microstructures fully coated with sub-micrometer thick diamond like carbon (DLC) film using plasma enhanced chemical vapor deposition (PECVD). To minimize the deformations or damages caused by non-uniform coating of DLC, which has high compression residual stress, released SCS specimens with the dimensions of 120 µm long, 4 µm wide, and 5 µm thick were coated from the top and bottom side simultaneously. The thickness of DLC coating is around 150 nm and three different bias voltages were used for deposition. The tensile strength improved from 13.4 to 53.5% with the increasing of negative bias voltage. In addition, the deviation in strength also reduced significantly compared to bare SCS sample.

Effect of nickel oxide seed layers on annealed-amorphous titanium oxide thin films prepared using plasma-enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Wu, Cheng-Yang; Hong, Shao-Chyang; Hwang, Fu-Tsai; Lai, Li-Wen; Lin, Tan-Wei; Liu, Day-Shan

2011-01-01

The effect of a nickel oxide (NiO x ) seed layer on the crystallization and photocatalytic activity of the sequentially plasma-enhanced chemical vapor deposited amorphous titanium oxide (TiO x ) thin film processed by a post-annealing process was investigated. The evolution of the crystalline structures, chemical bond configurations, and surface/cross-sectional morphologies of the annealed TiO x films, with and without a NiO x seed layer, was examined using X-ray diffractometer, Fourier transform infrared spectrometry, X-ray photoelectron spectroscopy, atomic force microscopy, and field emission scanning electron microscope measurements. Thermo- and photo-induced hydrophilicity was determined by measuring the contact angle of water droplet. Photocatalytic activity after UV light irradiation was evaluated from the decolorization of a methylene blue solution. The crystallization temperature of the TiO x film, deposited on a NiO x seed layer, was found to be lower than that of a pure TiO x film, further improving the thermo- and photo-induced surface super-hydrophilicity. The TiO x film deposited onto the NiO x seed layer, resulting in significant cluster boundaries, showed a rough surface morphology and proved to alleviate the anatase crystal growth by increasing the post-annealing temperature, which yielded a more active surface area and prohibited the recombination of photogenerated electrons and holes. The photocatalytic activity of the NiO x /TiO x system with such a textured surface therefore was enhanced and optimized through an adequate post-annealing process.

Effect of nickel oxide seed layers on annealed-amorphous titanium oxide thin films prepared using plasma-enhanced chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Wu, Cheng-Yang; Hong, Shao-Chyang [Institute of Electro-Optical and Materials Science, National Formosa University, Huwei, Yunlin, 63201, Taiwan (China); Hwang, Fu-Tsai [Department of Electro-Optical Engineering, National United University, Miao-Li, 36003, Taiwan (China); Lai, Li-Wen [ITRI South, Industrial Technology Research Institute, Liujia, Tainan, 73445, Taiwan (China); Lin, Tan-Wei [Institute of Electro-Optical and Materials Science, National Formosa University, Huwei, Yunlin, 63201, Taiwan (China); Liu, Day-Shan, E-mail: dsliu@sunws.nfu.edu.tw [Institute of Electro-Optical and Materials Science, National Formosa University, Huwei, Yunlin, 63201, Taiwan (China)

2011-10-31

The effect of a nickel oxide (NiO{sub x}) seed layer on the crystallization and photocatalytic activity of the sequentially plasma-enhanced chemical vapor deposited amorphous titanium oxide (TiO{sub x}) thin film processed by a post-annealing process was investigated. The evolution of the crystalline structures, chemical bond configurations, and surface/cross-sectional morphologies of the annealed TiO{sub x} films, with and without a NiO{sub x} seed layer, was examined using X-ray diffractometer, Fourier transform infrared spectrometry, X-ray photoelectron spectroscopy, atomic force microscopy, and field emission scanning electron microscope measurements. Thermo- and photo-induced hydrophilicity was determined by measuring the contact angle of water droplet. Photocatalytic activity after UV light irradiation was evaluated from the decolorization of a methylene blue solution. The crystallization temperature of the TiO{sub x} film, deposited on a NiO{sub x} seed layer, was found to be lower than that of a pure TiO{sub x} film, further improving the thermo- and photo-induced surface super-hydrophilicity. The TiO{sub x} film deposited onto the NiO{sub x} seed layer, resulting in significant cluster boundaries, showed a rough surface morphology and proved to alleviate the anatase crystal growth by increasing the post-annealing temperature, which yielded a more active surface area and prohibited the recombination of photogenerated electrons and holes. The photocatalytic activity of the NiO{sub x}/TiO{sub x} system with such a textured surface therefore was enhanced and optimized through an adequate post-annealing process.

Magnetic Field Dependence and Q of the Josephson Plasma Resonance

DEFF Research Database (Denmark)

Pedersen, Niels Falsig; Finnegan, T. F.; Langenberg, D. N.

1972-01-01

of supercurrent density which is not observed in conventional measurements of the field-dependent critical current. The frequency and field dependence of the plasma-resonance linewidth are interpreted as evidence that the previously unobserved quasiparticle-pair-interference tunnel current predicted by Josephson...

Performance Improvement of Microcrystalline p-SiC/i-Si/n-Si Thin Film Solar Cells by Using Laser-Assisted Plasma Enhanced Chemical Vapor Deposition

Directory of Open Access Journals (Sweden)

Hsin-Ying Lee

2014-01-01

Full Text Available The microcrystalline p-SiC/i-Si/n-Si thin film solar cells treated with hydrogen plasma were fabricated at low temperature using a CO2 laser-assisted plasma enhanced chemical vapor deposition (LAPECVD system. According to the micro-Raman results, the i-Si films shifted from 482 cm−1 to 512 cm−1 as the assisting laser power increased from 0 W to 80 W, which indicated a gradual transformation from amorphous to crystalline Si. From X-ray diffraction (XRD results, the microcrystalline i-Si films with (111, (220, and (311 diffraction were obtained. Compared with the Si-based thin film solar cells deposited without laser assistance, the short-circuit current density and the power conversion efficiency of the solar cells with assisting laser power of 80 W were improved from 14.38 mA/cm2 to 18.16 mA/cm2 and from 6.89% to 8.58%, respectively.

On the gyro resonance electron-whistler interaction in transition layers of near-earth plasma

International Nuclear Information System (INIS)

Erokhin, N.S.; Zol'nikova, N.N.; Mikhajlovskaya, L.A.

1996-01-01

Gyro resonance interaction of electrons with low amplitude triggered whistler in the transition layers of the ionospheric and magnetospheric plasma that correspond to the blurred jumps of the magnetic field and plasma concentration was studied

Threshold enhancement of diphoton resonances

Directory of Open Access Journals (Sweden)

Aoife Bharucha

2016-10-01

Full Text Available We revisit a mechanism to enhance the decay width of (pseudo-scalar resonances to photon pairs when the process is mediated by loops of charged fermions produced near threshold. Motivated by the recent LHC data, indicating the presence of an excess in the diphoton spectrum at approximately 750 GeV, we illustrate this threshold enhancement mechanism in the case of a 750 GeV pseudoscalar boson A with a two-photon decay mediated by a charged and uncolored fermion having a mass at the 12MA threshold and a small decay width, <1 MeV. The implications of such a threshold enhancement are discussed in two explicit scenarios: i the Minimal Supersymmetric Standard Model in which the A state is produced via the top quark mediated gluon fusion process and decays into photons predominantly through loops of charginos with masses close to 12MA and ii a two Higgs doublet model in which A is again produced by gluon fusion but decays into photons through loops of vector-like charged heavy leptons. In both these scenarios, while the mass of the charged fermion has to be adjusted to be extremely close to half of the A resonance mass, the small total widths are naturally obtained if only suppressed three-body decay channels occur. Finally, the implications of some of these scenarios for dark matter are discussed.

Atmospheric Pressure Plasma Induced Sterilization and Chemical Neutralization

Science.gov (United States)

Garate, Eusebio; Evans, Kirk; Gornostaeva, Olga; Alexeff, Igor; Lock Kang, Weng; Wood, Thomas K.

1998-11-01

We are studying chemical neutralization and surface decontamination using atmospheric pressure plasma discharges. The plasma is produced by corona discharge from an array of pins and a ground plane. The array is constructed so that various gases, like argon or helium, can be flowed past the pins where the discharge is initiated. The pin array can be biased using either DC, AC or pulsed discharges. Results indicate that the atmospheric plasma is effective in sterilizing surfaces with biological contaminants like E-coli and bacillus subtilus cells. Exposure times of less than four minutes in an air plasma result in a decrease in live colony counts by six orders of magnitude. Greater exposure times result in a decrease of live colony counts of up to ten orders of magnitude. The atmospheric pressure discharge is also effective in decomposing organic phosphate compounds that are simulants for chemical warfare agents. Details of the decomposition chemistry, by-product formation, and electrical energy consumption of the system will be discussed.

Effect of growth interruptions on TiO{sub 2} films deposited by plasma enhanced chemical vapour deposition

Energy Technology Data Exchange (ETDEWEB)

Li, D., E-mail: dyli@yzu.edu.cn [College of Mechanical Engineering, Yangzhou University, Yangzhou, 225127 (China); Goullet, A. [Institut des Matériaux Jean Rouxel (IMN), UMR CNRS 6502, 2 rue de la Houssinière, 44322, Nantes (France); Carette, M. [Institut d’Electronique, de Microélectronique et de Nanotechnologie (IEMN), UMR CNRS 8520, Avenue Poincaré, 59652, Villeneuve d' Ascq (France); Granier, A. [Institut des Matériaux Jean Rouxel (IMN), UMR CNRS 6502, 2 rue de la Houssinière, 44322, Nantes (France); Landesman, J.P. [Institut de Physique de Rennes, UMR CNRS 6251, 263 av. Général Leclerc, 35042, Rennes (France)

2016-10-01

TiO{sub 2} films of ∼300 nm were deposited at low temperature (<140 °C) and pressure (0.4 Pa) using plasma enhanced chemical vapour deposition at the floating potential (V{sub f}) or the substrate self-bias voltage (V{sub b}) of −50 V. The impact of growth interruptions on the morphology, microstructure and optical properties of the films was investigated. The interruptions were carried out by stopping the plasma generation and gas injection once the increase of the layer thickness during each deposition step was about ∼100 nm. In one case of V{sub f}, the films of ∼300 nm exhibit a columnar morphology consisting of a bottom dense layer, an intermediate gradient layer and a top roughness layer. But the growth interruptions result in an increase of the dense layer thickness and a decrease of surface roughness. The film inhomogeneity has been identified by the in-situ real-time evolution of the kinetic ellipsometry (KE) parameters and the modeling process of spectroscopic ellipsometry (SE). The discrepancy of the refractive index measured by SE between bottom and upper layers can be reduced by growth interruptions. In the other case of V{sub b} = −50 V, the films exhibit a more compact arrangement which is homogeneous along the growth direction as confirmed by KE and SE. Both of Fourier transform infrared spectra and X-ray diffraction illustrate a phase transformation from anatase to rutile with the bias of −50 V, and also evidenced on the evolution of the refractive index dispersion curves. And a greatly increase of the refractive indice in the transparent range can be identified. However, the growth interruptions seem to have no influence on the morphology and optical properties in this case. - Highlights: • TiO{sub 2} films deposited by plasma processes at low temperature and pressure. • Influence of growth interruptions on structural and optical properties. • In-situ real-time ellipsometry measurements on film properties. • Structural and

Surface Acoustic Wave (SAW-Enhanced Chemical Functionalization of Gold Films

Directory of Open Access Journals (Sweden)

Gina Greco

2017-10-01

Full Text Available Surface chemical and biochemical functionalization is a fundamental process that is widely applied in many fields to add new functions, features, or capabilities to a material’s surface. Here, we demonstrate that surface acoustic waves (SAWs can enhance the chemical functionalization of gold films. This is shown by using an integrated biochip composed by a microfluidic channel coupled to a surface plasmon resonance (SPR readout system and by monitoring the adhesion of biotin-thiol on the gold SPR areas in different conditions. In the case of SAW-induced streaming, the functionalization efficiency is improved ≈ 5 times with respect to the case without SAWs. The technology here proposed can be easily applied to a wide variety of biological systems (e.g., proteins, nucleic acids and devices (e.g., sensors, devices for cell cultures.

Controlled growth of carbon nanofibers using plasma enhanced chemical vapor deposition: Effect of catalyst thickness and gas ratio

International Nuclear Information System (INIS)

Saidin, M.A.R.; Ismail, A.F.; Sanip, S.M.; Goh, P.S.; Aziz, M.; Tanemura, M.

2012-01-01

The characteristics of carbon nanofibers (CNFs) grown, using direct current plasma enhanced chemical vapor deposition system reactor under various acetylene to ammonia gas ratios and different catalyst thicknesses were studied. Nickel/Chromium-glass (Ni/Cr-glass) thin film catalyst was employed for the growth of CNF. The grown CNFs were then characterized using Raman spectroscopy, field emission scanning electron microscopy and transmission electron microscopy (TEM). Raman spectroscopy showed that the Ni/Cr-glass with thickness of 15 nm and gas ratio acetylene to ammonia of 1:3 produced CNFs with the lowest I D /I G value (the relative intensity of D-band to G-band). This indicated that this catalyst thickness and gas ratio value is the optimum combination for the synthesis of CNFs under the conditions studied. TEM observation pointed out that the CNFs produced have 104 concentric walls and the residual catalyst particles were located inside the tubes of CNFs. It was also observed that structural morphology of the grown CNFs was influenced by acetylene to ammonia gas ratio and catalyst thickness.

Controlled growth of carbon nanofibers using plasma enhanced chemical vapor deposition: Effect of catalyst thickness and gas ratio

Energy Technology Data Exchange (ETDEWEB)

Saidin, M.A.R. [Advanced Membrane Technology Research Centre (AMTEC), Universiti Teknologi Malaysia, 81310 Skudai, Johor Bahru (Malaysia); Ismail, A.F., E-mail: afauzi@utm.my [Advanced Membrane Technology Research Centre (AMTEC), Universiti Teknologi Malaysia, 81310 Skudai, Johor Bahru (Malaysia); Sanip, S.M.; Goh, P.S.; Aziz, M. [Advanced Membrane Technology Research Centre (AMTEC), Universiti Teknologi Malaysia, 81310 Skudai, Johor Bahru (Malaysia); Tanemura, M. [Department of Frontier Material, Graduate School of Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555 (Japan)

2012-01-31

The characteristics of carbon nanofibers (CNFs) grown, using direct current plasma enhanced chemical vapor deposition system reactor under various acetylene to ammonia gas ratios and different catalyst thicknesses were studied. Nickel/Chromium-glass (Ni/Cr-glass) thin film catalyst was employed for the growth of CNF. The grown CNFs were then characterized using Raman spectroscopy, field emission scanning electron microscopy and transmission electron microscopy (TEM). Raman spectroscopy showed that the Ni/Cr-glass with thickness of 15 nm and gas ratio acetylene to ammonia of 1:3 produced CNFs with the lowest I{sub D}/I{sub G} value (the relative intensity of D-band to G-band). This indicated that this catalyst thickness and gas ratio value is the optimum combination for the synthesis of CNFs under the conditions studied. TEM observation pointed out that the CNFs produced have 104 concentric walls and the residual catalyst particles were located inside the tubes of CNFs. It was also observed that structural morphology of the grown CNFs was influenced by acetylene to ammonia gas ratio and catalyst thickness.

Influence of krypton atoms on the structure of hydrogenated amorphous carbon deposited by plasma enhanced chemical vapor deposition

Science.gov (United States)

Oliveira, M. H.; Viana, G. A.; de Lima, M. M.; Cros, A.; Cantarero, A.; Marques, F. C.

2010-12-01

Hydrogenated amorphous carbon (a-C:H) films were prepared by plasma enhanced chemical vapor deposition using methane (CH4) plus krypton (Kr) mixed atmosphere. The depositions were performed as function of the bias voltage and krypton partial pressure. The goal of this work was to study the influence of krypton gas on the physical properties of a-C:H films deposited on the cathode electrode. Krypton concentration up to 1.6 at. %, determined by Rutherford Back-Scattering, was obtained at high Kr partial pressure and bias of -120 V. The structure of the films was analyzed by means of optical transmission spectroscopy, multi-wavelength Raman scattering and Fourier Transform Infrared spectroscopy. It was verified that the structure of the films remains unchanged up to a concentration of Kr of about 1.0 at. %. A slight graphitization of the films occurs for higher concentration. The observed variation in the film structure, optical band gap, stress, and hydrogen concentration were associated mainly with the subplantation process of hydrocarbons radicals, rather than the krypton ion energy.

Influence of krypton atoms on the structure of hydrogenated amorphous carbon deposited by plasma enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Oliveira, M. H. Jr.; Viana, G. A.; Marques, F. C.; Lima, M. M. Jr. de; Cros, A.; Cantarero, A.

2010-01-01

Hydrogenated amorphous carbon (a-C:H) films were prepared by plasma enhanced chemical vapor deposition using methane (CH 4 ) plus krypton (Kr) mixed atmosphere. The depositions were performed as function of the bias voltage and krypton partial pressure. The goal of this work was to study the influence of krypton gas on the physical properties of a-C:H films deposited on the cathode electrode. Krypton concentration up to 1.6 at. %, determined by Rutherford Back-Scattering, was obtained at high Kr partial pressure and bias of -120 V. The structure of the films was analyzed by means of optical transmission spectroscopy, multi-wavelength Raman scattering and Fourier Transform Infrared spectroscopy. It was verified that the structure of the films remains unchanged up to a concentration of Kr of about 1.0 at. %. A slight graphitization of the films occurs for higher concentration. The observed variation in the film structure, optical band gap, stress, and hydrogen concentration were associated mainly with the subplantation process of hydrocarbons radicals, rather than the krypton ion energy.

Resonantly enhanced collisional ionization measurements of radionuclides

International Nuclear Information System (INIS)

Whitaker, T.J.; Bushaw, B.A.; Gerke, G.K.

1986-01-01

The authors developed a new laser technique to analyze for radionuclides at extremely low levels. The technique, called resonantly enhanced collisional ionization (RECI), uses two nitrogen-laser pumped dye lasers to excite the target isotope to a high-energy Rydberg state. Atoms in these Rydberg states (within a few hundred wavenumbers in energy from the ionization threshold) efficiently ionize upon colliding with an inert gas and the ions can be detected by conventional means. The principal advantage of resonantly-enhanced collisional ionization is the extreme sensitivity coupled with its relative simplicity and low cost. Actinides typically have an ionization potential of about 6eV (uranium I.P. = 6.2 eV, plutonium I.P. = 5.7 eV). Two-step laser excitation to a state just below threshold requires wavelengths in the blue region of the visible spectrum. They showed that when both steps in the excitation process are resonant steps, relatively low-power lasers can populate the Rydberg state with almost unit efficiency. This is because the resonant excitations have much larger cross-sections than do photoionization processes. They also demonstrated that a few torr of a buffer gas will cause most of the excited-state atoms to be ionized

The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition

Czech Academy of Sciences Publication Activity Database

Červenka, Jiří; Ledinský, Martin; Stuchlík, Jiří; Stuchlíková, The-Ha; Bakardjieva, Snejana; Hruška, Karel; Fejfar, Antonín; Kočka, Jan

2010-01-01

Roč. 21, č. 41 (2010), 415604/1-415604/7 ISSN 0957-4484 R&D Projects: GA MŠk(CZ) LC06040; GA AV ČR KAN400100701; GA MŠk LC510 EU Projects: European Commission(XE) 240826 - PolySiMode Institutional research plan: CEZ:AV0Z10100521; CEZ:AV0Z40320502 Keywords : nanoneedles * nanowires * silicon * plasma * chemical vapor deposition * crystal structure * growth * phonon * SEM * Raman Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 3.644, year: 2010

Titanium nitride plasma-chemical synthesis with titanium tetrachloride raw material in the DC plasma-arc reactor

Science.gov (United States)

Kirpichev, D. E.; Sinaiskiy, M. A.; Samokhin, A. V.; Alexeev, N. V.

2017-04-01

The possibility of plasmochemical synthesis of titanium nitride is demonstrated in the paper. Results of the thermodynamic analysis of TiCl4 - H2 - N2 system are presented; key parameters of TiN synthesis process are calculated. The influence of parameters of plasma-chemical titanium nitride synthesis process in the reactor with an arc plasmatron on characteristics on the produced powders is experimentally investigated. Structure, chemical composition and morphology dependencies on plasma jet enthalpy, stoichiometric excess of hydrogen and nitrogen in a plasma jet are determined.

Non-resonant terahertz field enhancement in periodically arranged nanoslits

DEFF Research Database (Denmark)

Novitsky, Andrey; Ivinskaya, Aliaksandra; Zalkovskij, Maksim

2012-01-01

We analyze ultra strong non-resonant field enhancement of THz field in periodic arrays of nanoslits cut in ultrathin metal films. The main feature of our approach is that the slit size and metal film thickness are several orders of magnitude smaller than the wavelength λ of the impinging radiatio...... by the microscopic Drude-Lorentz model taking into account retardation processes in the metal film and validated by the finite difference frequency domain method. We expect sensor and modulation applications of the predicted giant broadband field enhancement.......We analyze ultra strong non-resonant field enhancement of THz field in periodic arrays of nanoslits cut in ultrathin metal films. The main feature of our approach is that the slit size and metal film thickness are several orders of magnitude smaller than the wavelength λ of the impinging radiation...... approaches the THz wavelength but before entering the Raleigh-Wood anomaly, the field enhancement in nanoslit stays close to that in a single isolated slit, i.e., the well-known inversefrequency dependence. Both regimes are non-resonant and thus extremely broadband for P

Effects of Pretreatment on the Electronic Properties of Plasma Enhanced Chemical Vapor Deposition Hetero-Epitaxial Graphene Devices

Science.gov (United States)

Zhang, Lian-Chang; Shi, Zhi-Wen; Yang, Rong; Huang, Jian

2014-09-01

Quasi-monolayer graphene is successfully grown by the plasma enhanced chemical vapor deposition heteroepitaxial method we reported previously. To measure its electrical properties, the prepared graphene is fabricated into Hall ball shaped devices by the routine micro-fabrication method. However, impurity molecules adsorbed onto the graphene surface will impose considerable doping effects on the one-atom-thick film material. Our experiment demonstrates that pretreatment of the device by heat radiation baking and electrical annealing can dramatically influence the doping state of the graphene and consequently modify the electrical properties. While graphene in the as-fabricated device is highly p-doped, as confirmed by the position of the Dirac point at far more than +60 V, baking treatment at temperatures around 180°C can significantly lower the doping level and reduce the conductivity. The following electrical annealing is much more efficient to desorb the extrinsic molecules, as confirmed by the in situ measurement, and as a result, further modify the doping state and electrical properties of the graphene, causing a considerable drop of the conductivity and a shifting of Dirac point from beyond +60 V to 0 V.

Nanomechanical resonators and their applications in biological/chemical detection: Nanomechanics principles

International Nuclear Information System (INIS)

Eom, Kilho; Park, Harold S.; Yoon, Dae Sung; Kwon, Taeyun

2011-01-01

Recent advances in nanotechnology have led to the development of nano-electro-mechanical systems (NEMS) such as nanomechanical resonators, which have recently received significant attention from the scientific community. This is not only due to their capability of label-free detection of bio/chemical molecules at single-molecule (or atomic) resolution for future applications such as the early diagnosis of diseases like cancer, but also due to their unprecedented ability to detect physical quantities such as molecular weight, elastic stiffness, surface stress, and surface elastic stiffness for adsorbed molecules on the surface. Most experimental works on resonator-based molecular detection have been based on the principle that molecular adsorption onto a resonator surface increases the effective mass, and consequently decreases the resonant frequencies of the nanomechanical resonator. However, this principle is insufficient to provide fundamental insights into resonator-based molecular detection at the nanoscale; this is due to recently proposed novel nanoscale detection principles including various effects such as surface effects, nonlinear oscillations, coupled resonance, and stiffness effects. Furthermore, these effects have only recently been incorporated into existing physical models for resonators, and therefore the universal physical principles governing nanoresonator-based detection have not been completely described. Therefore, our objective in this review is to overview the current attempts to understand the underlying mechanisms in nanoresonator-based detection using physical models coupled to computational simulations and/or experiments. Specifically, we will focus on issues of special relevance to the dynamic behavior of nanoresonators and their applications in biological/chemical detection: the resonance behavior of micro/nanoresonators; resonator-based chemical/biological detection; physical models of various nanoresonators such as nanowires, carbon

An Investigation on the He−(1s2s2 2S Resonance in Debye Plasmas

Directory of Open Access Journals (Sweden)

Arijit Ghoshal

2017-01-01

Full Text Available The effect of Debye plasma on the 1 s 2 s 2 2 S resonance states in the scattering of electron from helium atom has been investigated within the framework of the stabilization method. The interactions among the charged particles in Debye plasma have been modelled by Debye–Huckel potential. The 1 s 2 s excited state of the helium atom has been treated as consisting of a H e + ionic core plus an electron moving around. The interaction between the core and the electron has then been modelled by a model potential. It has been found that the background plasma environment significantly affects the resonance states. To the best of our knowledge, such an investigation of 1 s 2 s 2 2 S resonance states of the electron–helium system embedded in Debye plasma environment is the first reported in the literature.

Adhesion enhancement of Al coatings on carbon/epoxy composite surfaces by atmospheric plasma

International Nuclear Information System (INIS)

Coulon, J.F.; Tournerie, N.; Maillard, H.

2013-01-01

Adhesion strengths between aluminium thin film coatings and manufactured carbon/epoxy composite surfaces were measured by assessing fracture tensile strengths using pull-off tests. The effect of the substrate roughness (nm to μm) of these composite surfaces on adhesion was studied by examining the surface free energies and adhesion strengths. The adhesion strengths of the coatings varied significantly. To improve the coating adhesion, each composite surface was treated with atmospheric plasma prior to deposition, which resulted in an increase in the surface free energy from approximately 40 mJ/m 2 to 70 mJ/m 2 because the plasma pretreatment led to the formation of hydrophilic C-O and C=O bonds on the composite surfaces, as demonstrated by X-ray photoelectron spectroscopy analyses. The adhesion strengths of the coatings were enhanced for all surface roughnesses studied. In our study, the effect of mechanical adhesion due to roughness was separated from the effect of modifying the chemical bonds with plasma activation. The adhesion ability of the pure resin was relatively weak. Increasing the surface roughness largely improved the adhesion of the resin surface. Plasma treatment of the pure resin also increased the surface adhesion. Our study shows that plasma activation effectively enhances the adhesion of manufactured composites, even when the surface roughness is on the order of microns. The ageing of the surface activation was also investigated, and the results demonstrate that atmospheric plasma has potential for use in the pretreatment of composite materials.

Enhanced THz extinction in arrays of resonant semiconductor particles

NARCIS (Netherlands)

Schaafsma, M. C.; Georgiou, G.; J. Gomez Rivas,

2015-01-01

We demonstrate experimentally the enhanced THz extinction by periodic arrays of resonant semiconductor particles. This phenomenon is explained in terms of the radiative coupling of localized resonances with diffractive orders in the plane of the array (Rayleigh anomalies). The experimental results

Semi-analytical model of laser resonance absorption in plasmas with a parabolic density profile

International Nuclear Information System (INIS)

Pestehe, S J; Mohammadnejad, M

2010-01-01

Analytical expressions for mode conversion and resonance absorption of electromagnetic waves in inhomogeneous, unmagnetized plasmas are required for laboratory and simulation studies. Although most of the analyses of this problem have concentrated on the linear plasma density profile, there are a few research works that deal with different plasma density profiles including the parabolic profile. Almost none of them could give clear analytical formulae for the electric and magnetic components of the electromagnetic field propagating through inhomogeneous plasmas. In this paper, we have considered the resonant absorption of laser light near the critical density of plasmas with parabolic electron density profiles followed by a uniform over-dense region and have obtained expressions for the electric and magnetic vectors of laser light propagating through the plasma. An estimation of the fractional absorption of laser energy has also been carried out. It has been shown that, in contrast to the linear density profile, the energy absorption depends explicitly on the value of collision frequency as well as on a new parameter, N, called the over-dense density order.

Comparative enhancing effects of electret with chemical enhancers on transdermal delivery of meloxicam in vitro

International Nuclear Information System (INIS)

Cui, L L; Hou, X M; Li, G D; Jiang, J; Liang, Y Y; Xin, X

2008-01-01

Electret offers enhancing effect in transdermal drug delivery for altering of the arrangement of lipid molecules in the stratum corneum, forming many transient permeable apertures and enhancing the transdermal drug delivery. In this paper, meloxicam patch formulations were developed to make the comparative study of transdermal drug delivery between electret and chemical enhancers. Patches were made into control, electret, chemical enhancer and electret with chemical enhancer ones, according to the preparation procedure. The electret combined with chemical enhancer patch was designed to probe the incorporation between electret and chemical enhancer in transdermal drug delivery. The meloxicam release from the patch was found to increase in order of blank, chemical enhancer, electret and electret with chemical enhancer patch, in general.

Clocking Femtosecond Collisional Dynamics via Resonant X-Ray Spectroscopy

Science.gov (United States)

van den Berg, Q. Y.; Fernandez-Tello, E. V.; Burian, T.; Chalupský, J.; Chung, H.-K.; Ciricosta, O.; Dakovski, G. L.; Hájková, V.; Hollebon, P.; Juha, L.; Krzywinski, J.; Lee, R. W.; Minitti, M. P.; Preston, T. R.; de la Varga, A. G.; Vozda, V.; Zastrau, U.; Wark, J. S.; Velarde, P.; Vinko, S. M.

2018-02-01

Electron-ion collisional dynamics is of fundamental importance in determining plasma transport properties, nonequilibrium plasma evolution, and electron damage in diffraction imaging applications using bright x-ray free-electron lasers (FELs). Here we describe the first experimental measurements of ultrafast electron impact collisional ionization dynamics using resonant core-hole spectroscopy in a solid-density magnesium plasma, created and diagnosed with the Linac Coherent Light Source x-ray FEL. By resonantly pumping the 1 s →2 p transition in highly charged ions within an optically thin plasma, we have measured how off-resonance charge states are populated via collisional processes on femtosecond time scales. We present a collisional cross section model that matches our results and demonstrates how the cross sections are enhanced by dense-plasma effects including continuum lowering. Nonlocal thermodynamic equilibrium collisional radiative simulations show excellent agreement with the experimental results and provide new insight on collisional ionization and three-body-recombination processes in the dense-plasma regime.

Lipon thin films grown by plasma-enhanced metalorganic chemical vapor deposition in a N{sub 2}-H{sub 2}-Ar gas mixture

Energy Technology Data Exchange (ETDEWEB)

Meda, Lamartine, E-mail: LMeda@xula.edu [Department of Chemistry, Xavier University of Louisiana, 1 Drexel Drive, New Orleans, LA, 70125 (United States); Maxie, Eleston E. [Excellatron Solid State LLC, 263 Decatur Street, Atlanta, GA 30312 (United States)

2012-01-01

Lithium phosphorus oxynitride (Lipon) thin films have been deposited by a plasma-enhanced metalorganic chemical vapor deposition method. Lipon thin films were deposited on approximately 0.2 {mu}m thick Au-coated alumina substrates in a N{sub 2}-H{sub 2}-Ar plasma at 13.56 MHz, a power of 150 W, and at 180 Degree-Sign C using triethyl phosphate [(CH{sub 2}CH{sub 3}){sub 3}PO{sub 4}] and lithium tert-butoxide [(LiOC(CH{sub 3}){sub 3}] precursors. Lipon growth rates ranged from 10 to 42 nm/min and thicknesses varied from 1 to 2.5 {mu}m. X-ray powder diffraction showed that the films were amorphous, and X-ray photoelectron spectroscopy (XPS) revealed approximately 4 at.% N in the films. The ionic conductivity of Lipon was measured by electrochemical impedance spectroscopy to be approximately 1.02 {mu}S/cm, which is consistent with the ionic conductivity of Lipon deposited by radio frequency magnetron sputtering of Li{sub 3}PO{sub 4} targets in either mixed Ar-N{sub 2} or pure N{sub 2} atmosphere. Attempts to deposit Lipon in a N{sub 2}-O{sub 2}-Ar plasma resulted in the growth of Li{sub 3}PO{sub 4} thin films. The XPS analysis shows no C and N atom peaks. Due to the high impedance of these films, reliable conductivity measurements could not be obtained for films grown in N{sub 2}-O{sub 2}-Ar plasma.

Novel Chiroptical Analysis of Hemoglobin by Surface Enhanced Resonance Raman Optical Activity Spectroscopy

DEFF Research Database (Denmark)

Brazhe, Nadezda; Brazhe, Alexey; Sosnovtseva, Olga

2010-01-01

The metalloprotein hemoglobin (Hb) was studied using surface enhanced resonance Raman spectroscopy (SERRS) and surface enhanced resonance Raman optical activity (SERROA). The SERROA results are analyzed and compared with the SERRS, and the later to the resonance Raman (RRS) performed on Hb...

Chemical Penetration Enhancers for Transdermal Drug Delivery ...

African Journals Online (AJOL)

for transdermal administration. The permeation of drug through skin can be enhanced by both chemical penetration enhancement and physical methods. In this review, we have discussed the chemical penetration enhancement technology for transdermal drug delivery as well as the probable mechanisms of action.

Resonant metallic nanostructures for enhanced terahertz spectroscopy

KAUST Repository

Toma, A.; Tuccio, S.; Prato, M.; De Donato, F.; Perucchi, A.; Di Pietro, P.; Marras, S.; Liberale, Carlo; Zaccaria, R. Proietti; De Angelis, F.; Manna, L.; Lupi, S.; Di Fabrizio, Enzo M.; Razzari, L.

2015-01-01

We present our recent studies on terahertz resonant dipole nanoantennas. Exploiting the localization and enhancement capabilities of these devices, we introduce an effective method to perform terahertz spectroscopy on an extremely small number

Double plasma resonance instability as a source of solar zebra emission

Science.gov (United States)

Benáček, J.; Karlický, M.

2018-03-01

Context. The double plasma resonance (DPR) instability plays a basic role in the generation of solar radio zebras. In the plasma, consisting of the loss-cone type distribution of hot electrons and much denser and colder background plasma, this instability generates the upper-hybrid waves, which are then transformed into the electromagnetic waves and observed as radio zebras. Aims: In the present paper we numerically study the double plasma resonance instability from the point of view of the zebra interpretation. Methods: We use a 3-dimensional electromagnetic particle-in-cell (3D PIC) relativistic model. We use this model in two versions: (a) a spatially extended "multi-mode" model and (b) a spatially limited "specific-mode" model. While the multi-mode model is used for detailed computations and verifications of the results obtained by the "specific-mode" model, the specific-mode model is used for computations in a broad range of model parameters, which considerably save computational time. For an analysis of the computational results, we developed software tools in Python. Results: First using the multi-mode model, we study details of the double plasma resonance instability. We show how the distribution function of hot electrons changes during this instability. Then we show that there is a very good agreement between results obtained by the multi-mode and specific-mode models, which is caused by a dominance of the wave with the maximal growth rate. Therefore, for computations in a broad range of model parameters, we use the specific-mode model. We compute the maximal growth rates of the double plasma resonance instability with a dependence on the ratio between the upper-hybrid ωUH and electron-cyclotron ωce frequency. We vary temperatures of both the hot and background plasma components and study their effects on the resulting growth rates. The results are compared with the analytical ones. We find a very good agreement between numerical and analytical growth

Plasma heating in multiple-resonance excitation of a plasma in a mirror machine

Energy Technology Data Exchange (ETDEWEB)

Bender, A; Siambis, J G [Carnegie-Mellon Univ., Pittsburgh, Pa. (USA)

1976-06-01

By applying 1 kW of microwave power at 2.45 GHz and 1 kW of r.f. power in the frequency range of 4-25 MHz at one end of a mirror machine, where neutral hydrogen gas is injected in a pulsed mode, a plasma density of 2 x 10/sup 11/cm/sup -3/ with an electron temperature of 60 eV and ion temperature of 40 eV is generated. The ion heating mechanism, is, principally, collisional thermalization of the applied r.f. power, via coupling to and excitation of the low frequency resonances of the plasma column, in agreement with the theoretical prediction for the case of high total effective collision frequency for momentum transfer for the electrons.

Chemically Tuning the Localized Surface Plasmon Resonances of Gold Nanostructure Arrays

KAUST Repository

Zheng, Yue Bing

2009-04-30

We report on chemical etching of ordered Au nanostructure arrays to continuously tune their localized surface plasmon resonances (LSPR). Real-time extinction spectra were recorded from both Au nanodisks and nanospheres immobilized on glass substrates when immersed in Au etchant. The time-dependent LSPR frequencies, intensities, and bandwidths were studied theoretically with discrete dipole approximations and the Mie solution, and they were correlated with the evolution of the etched Au nanostructures\\' morphology (as examined by atomic force microscopy). Since this chemical etching method can conveniently and accurately tune LSPR, it offers precise control of plasmonic properties and can be useful in applications such as surfaceenhanced Raman spectroscopy and molecular resonance spectroscopy. © 2009 American Chemical Society.

Non-linear magnetohydrodynamic modeling of plasma response to resonant magnetic perturbations

Energy Technology Data Exchange (ETDEWEB)

Orain, F.; Bécoulet, M.; Dif-Pradalier, G.; Nardon, E.; Passeron, C.; Latu, G.; Grandgirard, V.; Fil, A.; Ratnani, A. [CEA, IRFM, F-13108 Saint-Paul-Lez-Durance (France); Huijsmans, G. [ITER Organization, Route de Vinon, F-13115 Saint-Paul-Lez-Durance (France); Pamela, S. [IIFS-PIIM. Aix Marseille Université - CNRS, 13397 Marseille Cedex20 (France); Chapman, I.; Kirk, A.; Thornton, A. [EURATOM/CCFE Fusion Association, Culham Science Centre, Oxon OX14 3DB (United Kingdom); Hoelzl, M. [Max-Planck-Institut für Plasmaphysik, EURATOM Association, Garching (Germany); Cahyna, P. [Association EURATOM/IPP.CR, Prague (Czech Republic)

2013-10-15

The interaction of static Resonant Magnetic Perturbations (RMPs) with the plasma flows is modeled in toroidal geometry, using the non-linear resistive MHD code JOREK, which includes the X-point and the scrape-off-layer. Two-fluid diamagnetic effects, the neoclassical poloidal friction and a source of toroidal rotation are introduced in the model to describe realistic plasma flows. RMP penetration is studied taking self-consistently into account the effects of these flows and the radial electric field evolution. JET-like, MAST, and ITER parameters are used in modeling. For JET-like parameters, three regimes of plasma response are found depending on the plasma resistivity and the diamagnetic rotation: at high resistivity and slow rotation, the islands generated by the RMPs at the edge resonant surfaces rotate in the ion diamagnetic direction and their size oscillates. At faster rotation, the generated islands are static and are more screened by the plasma. An intermediate regime with static islands which slightly oscillate is found at lower resistivity. In ITER simulations, the RMPs generate static islands, which forms an ergodic layer at the very edge (ψ≥0.96) characterized by lobe structures near the X-point and results in a small strike point splitting on the divertor targets. In MAST Double Null Divertor geometry, lobes are also found near the X-point and the 3D-deformation of the density and temperature profiles is observed.

The Chemical Potential of Plasma Membrane Cholesterol: Implications for Cell Biology.

Science.gov (United States)

Ayuyan, Artem G; Cohen, Fredric S

2018-02-27

Cholesterol is abundant in plasma membranes and exhibits a variety of interactions throughout the membrane. Chemical potential accounts for thermodynamic consequences of molecular interactions, and quantifies the effective concentration (i.e., activity) of any substance participating in a process. We have developed, to our knowledge, the first method to measure cholesterol chemical potential in plasma membranes. This was accomplished by complexing methyl-β-cyclodextrin with cholesterol in an aqueous solution and equilibrating it with an organic solvent containing dissolved cholesterol. The chemical potential of cholesterol was thereby equalized in the two phases. Because cholesterol is dilute in the organic phase, here activity and concentration were equivalent. This equivalence allowed the amount of cholesterol bound to methyl-β-cyclodextrin to be converted to cholesterol chemical potential. Our method was used to determine the chemical potential of cholesterol in erythrocytes and in plasma membranes of nucleated cells in culture. For erythrocytes, the chemical potential did not vary when the concentration was below a critical value. Above this value, the chemical potential progressively increased with concentration. We used standard cancer lines to characterize cholesterol chemical potential in plasma membranes of nucleated cells. This chemical potential was significantly greater for highly metastatic breast cancer cells than for nonmetastatic breast cancer cells. Chemical potential depended on density of the cancer cells. A method to alter and fix the cholesterol chemical potential to any value (i.e., a cholesterol chemical potential clamp) was also developed. Cholesterol content did not change when cells were clamped for 24-48 h. It was found that the level of activation of the transcription factor STAT3 increased with increasing cholesterol chemical potential. The cholesterol chemical potential may regulate signaling pathways. Copyright © 2018. Published by

The permittivity of a plasma at cyclotron resonance in large amplitude e.m. fields

NARCIS (Netherlands)

Schram, D.C.

1970-01-01

The permittivity of a collisionless plasma as a function of field parameters is measured in standing and in travelling waves. In both experiments the permittivity remains finite at cyclotron resonance; the resonance is broadened and shifted towards higher values of the magnetic field strength. The

Enhancement of plasma generation in catalyst pores with different shapes

Science.gov (United States)

Zhang, Yu-Ru; Neyts, Erik C.; Bogaerts, Annemie

2018-05-01

Plasma generation inside catalyst pores is of utmost importance for plasma catalysis, as the existence of plasma species inside the pores affects the active surface area of the catalyst available to the plasma species for catalytic reactions. In this paper, the electric field enhancement, and thus the plasma production inside catalyst pores with different pore shapes is studied with a two-dimensional fluid model. The results indicate that the electric field will be significantly enhanced near tip-like structures. In a conical pore with small opening, the strongest electric field appears at the opening and bottom corners of the pore, giving rise to a prominent ionization rate throughout the pore. For a cylindrical pore, the electric field is only enhanced at the bottom corners of the pore, with lower absolute value, and thus the ionization rate inside the pore is only slightly enhanced. Finally, in a conical pore with large opening, the electric field is characterized by a maximum at the bottom of the pore, yielding a similar behavior for the ionization rate. These results demonstrate that the shape of the pore has a significantly influence on the electric field enhancement, and thus modifies the plasma properties.

Electron cyclotron resonance plasmas and electron cyclotron resonance ion sources: Physics and technology (invited)

International Nuclear Information System (INIS)

Girard, A.; Hitz, D.; Melin, G.; Serebrennikov, K.

2004-01-01

Electron cyclotron resonance (ECR) ion sources are scientific instruments particularly useful for physics: they are extensively used in atomic, nuclear, and high energy physics, for the production of multicharged beams. Moreover, these sources are also of fundamental interest for plasma physics, because of the very particular properties of the ECR plasma. This article describes the state of the art on the physics of the ECR plasma related to multiply charged ion sources. In Sec. I, we describe the general aspects of ECR ion sources. Physics related to the electrons is presented in Sec. II: we discuss there the problems of heating and confinement. In Sec. III, the problem of ion production and confinement is presented. A numerical code is presented, and some particular and important effects, specific to ECR ion sources, are shown in Sec. IV. Eventually, in Sec. V, technological aspects of ECR are presented and different types of sources are shown

Magnetic resonance image enhancement using V-filter

International Nuclear Information System (INIS)

Yamamoto, H.; Sugita, K.; Kanzaki, N.; Johja, I.; Hiraki, Y.

1990-01-01

The purpose of this study is to present a method of boundary enhancement algorithms for magnetic resonance images using a V-filter. The boundary of the brain tumor was precisely extracted by the region segmentation techniques

Resonant metallic nanostructures for enhanced terahertz spectroscopy

KAUST Repository

Toma, A.

2015-11-12

We present our recent studies on terahertz resonant dipole nanoantennas. Exploiting the localization and enhancement capabilities of these devices, we introduce an effective method to perform terahertz spectroscopy on an extremely small number of nano-objects.

Electron plasma waves and plasma resonances

International Nuclear Information System (INIS)

Franklin, R N; Braithwaite, N St J

2009-01-01

In 1929 Tonks and Langmuir predicted of the existence of electron plasma waves in an infinite, uniform plasma. The more realistic laboratory environment of non-uniform and bounded plasmas frustrated early experiments. Meanwhile Landau predicted that electron plasma waves in a uniform collisionless plasma would appear to be damped. Subsequent experimental work verified this and revealed the curious phenomenon of plasma wave echoes. Electron plasma wave theory, extended to finite plasmas, has been confirmed by various experiments. Nonlinear phenomena, such as particle trapping, emerge at large amplitude. The use of electron plasma waves to determine electron density and electron temperature has not proved as convenient as other methods.

Permanent magnet electron cyclotron resonance plasma source with remote window

International Nuclear Information System (INIS)

Berry, L.A.; Gorbatkin, S.M.

1995-01-01

An electron cyclotron resonance (ECR) plasma has been used in conjunction with a solid metal sputter target for Cu deposition over 200 mm diameters. The goal is to develop a deposition system and process suitable for filling submicron, high-aspect ratio ULSI features. The system uses a permanent magnet for creation of the magnetic field necessary for ECR, and is significantly more compact than systems equipped with electromagnets. A custom launcher design allows remote microwave injection with the microwave entrance window shielded from the copper flux. When microwaves are introduced at an angle with respect to the plasma, high electron densities can be produced with a plasma frequency significantly greater than the electron cyclotron frequency. Copper deposition rates of 1000 A/min have been achieved

Theoretical investigation of resonance frequencies in long wavelength electromagnetic wave scattering process from plasma prolate and oblate spheroids placed in a dielectric layer

Science.gov (United States)

Ahmadizadeh, Y.; Jazi, B.; Abdoli-Arani, A.

2014-01-01

Response of a prolate spheroid plasma and/or an oblate spheroid plasma in presence of long wavelength electromagnetic wave has been studied. The resonance frequencies of these objects are obtained and it is found that they reduce to the resonance frequency of spherical cold plasma. Moreover, the resonant frequencies of prolate spheroid plasma and oblate spheroid plasma covered by a dielectric are investigated as well. Furthermore, their dependency on dielectric permittivity and geometry dimensions is simulated.

Resonant creep enhancement in austenitic stainless steels due to pulsed irradiation at low doses

International Nuclear Information System (INIS)

Kishimoto, N.; Amekura, H.; Saito, T.

1994-01-01

Steady-state irradiation creep of austenitic stainless steels has been extensively studied as one of the most important design parameters in fusion reactors. The steady-state irradiation creep has been evaluated using in-pile and light-ion experiments. Those creep compliances of various austenitic steels range in the vicinity of ε/Gσ = 10 -6 ∼10 -5 (dpa sm-bullet MPa) -1 , depending on chemical composition etc. The mechanism of steady-state irradiation creep has been elucidated, essentially in terms of stress-induced preferential absorption of point defects into dislocations, and their climb motion. From this standpoint, low doses such as 10 -3 ∼10 -1 dpa would not give rise to any serious creep, and the irradiation creep may not be a critical issue for the low-dose fusion devices including ITER. It is, however, possible that pulsed irradiation causes different creep behaviors from the steady-state one due to dynamic unbalance of interstitials and vacancies. The authors have actually observed anomalous creep enhancement due to pulsed irradiation in austenitic stainless steels. The resonant behavior of creep indicates that pulsed irradiation may cause significant deformation in austenitic steels even at such low doses and slow pulsing rates, especially for the SA-materials. The first-wall materials in plasma operation of ∼10 2 s may suffer from unexpected transient creep, even in the near-term fusion deices, such as ITER. Though this effect might be a transient effect for a relatively short period, it should be taken into account that the pulsed irradiation makes influences on stress relaxation of the fusion components and on the irradiation fatigue. The mechanism and the relevant behaviors of pulse-induced creep will be discussed in terms of a point-defect model based on the resonant interstitial enrichment

Magnetic Resonance Imaging and Velocity Mapping in Chemical Engineering Applications.

Science.gov (United States)

Gladden, Lynn F; Sederman, Andrew J

2017-06-07

This review aims to illustrate the diversity of measurements that can be made using magnetic resonance techniques, which have the potential to provide insights into chemical engineering systems that cannot readily be achieved using any other method. Perhaps the most notable advantage in using magnetic resonance methods is that both chemistry and transport can be followed in three dimensions, in optically opaque systems, and without the need for tracers to be introduced into the system. Here we focus on hydrodynamics and, in particular, applications to rheology, pipe flow, and fixed-bed and gas-solid fluidized bed reactors. With increasing development of industrially relevant sample environments and undersampling data acquisition strategies that can reduce acquisition times to chemical engineering research.

Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

Czech Academy of Sciences Publication Activity Database

Prysiazhnyi, V.; Slavíček, P.; Mikmeková, Eliška; Klíma, M.

2016-01-01

Roč. 18, č. 4 (2016), s. 430-437 ISSN 1009-0630 Institutional support: RVO:68081731 Keywords : atmospheric pressure plasma * plasma jet * aluminium * surface treatment * surface processing * chemical precleaning Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 0.830, year: 2016

Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition

Science.gov (United States)

Turri, Rafael G.; Santos, Ricardo M.; Rangel, Elidiane C.; da Cruz, Nilson C.; Bortoleto, José R. R.; Dias da Silva, José H.; Antonio, César Augusto; Durrant, Steven F.

2013-09-01

Diverse amorphous hydrogenated carbon-based films (a-C:H, a-C:H:F, a-C:H:N, a-C:H:Cl and a-C:H:Si:O) were obtained by radiofrequency plasma enhanced chemical vapor deposition (PECVD) and plasma immersion ion implantation and deposition (PIIID). The same precursors were used in the production of each pair of each type of film, such as a-C:H, using both PECVD and PIIID. Optical properties, namely the refractive index, n, absorption coefficient, α, and optical gap, ETauc, of these films were obtained via transmission spectra in the ultraviolet-visible near-infrared range (wavelengths from 300 to 3300 nm). Film hardness, elastic modulus and stiffness were obtained as a function of depth using nano-indentation. Surface energy values were calculated from liquid drop contact angle data. Film roughness and morphology were assessed using atomic force microscopy (AFM). The PIIID films were usually thinner and possessed higher refractive indices than the PECVD films. Determined refractive indices are consistent with literature values for similar types of films. Values of ETauc were increased in the PIIID films compared to the PECVD films. An exception was the a-C:H:Si:O films, for which that obtained by PIIID was thicker and exhibited a decreased ETauc. The mechanical properties - hardness, elastic modulus and stiffness - of films produced by PECVD and PIIID generally present small differences. An interesting effect is the increase in the hardness of a-C:H:Cl films from 1.0 to 3.0 GPa when ion implantation is employed. Surface energy correlates well with surface roughness. The implanted films are usually smoother than those obtained by PECVD.

Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition

International Nuclear Information System (INIS)

Turri, Rafael G.; Santos, Ricardo M.; Rangel, Elidiane C.; Cruz, Nilson C. da; Bortoleto, José R.R.; Dias da Silva, José H.; Antonio, César Augusto; Durrant, Steven F.

2013-01-01

Diverse amorphous hydrogenated carbon-based films (a-C:H, a-C:H:F, a-C:H:N, a-C:H:Cl and a-C:H:Si:O) were obtained by radiofrequency plasma enhanced chemical vapor deposition (PECVD) and plasma immersion ion implantation and deposition (PIIID). The same precursors were used in the production of each pair of each type of film, such as a-C:H, using both PECVD and PIIID. Optical properties, namely the refractive index, n, absorption coefficient, α, and optical gap, E Tauc , of these films were obtained via transmission spectra in the ultraviolet–visible near-infrared range (wavelengths from 300 to 3300 nm). Film hardness, elastic modulus and stiffness were obtained as a function of depth using nano-indentation. Surface energy values were calculated from liquid drop contact angle data. Film roughness and morphology were assessed using atomic force microscopy (AFM). The PIIID films were usually thinner and possessed higher refractive indices than the PECVD films. Determined refractive indices are consistent with literature values for similar types of films. Values of E Tauc were increased in the PIIID films compared to the PECVD films. An exception was the a-C:H:Si:O films, for which that obtained by PIIID was thicker and exhibited a decreased E Tauc . The mechanical properties – hardness, elastic modulus and stiffness – of films produced by PECVD and PIIID generally present small differences. An interesting effect is the increase in the hardness of a-C:H:Cl films from 1.0 to 3.0 GPa when ion implantation is employed. Surface energy correlates well with surface roughness. The implanted films are usually smoother than those obtained by PECVD.

Active screen plasma nitriding enhances cell attachment to polymer surfaces

International Nuclear Information System (INIS)

Kaklamani, Georgia; Bowen, James; Mehrban, Nazia; Dong, Hanshan; Grover, Liam M.; Stamboulis, Artemis

2013-01-01

Active screen plasma nitriding (ASPN) is a well-established technique used for the surface modification of materials, the result of which is often a product with enhanced functional performance. Here we report the modification of the chemical and mechanical properties of ultra-high molecular weight poly(ethylene) (UHMWPE) using 80:20 (v/v) N 2 /H 2 ASPN, followed by growth of 3T3 fibroblasts on the treated and untreated polymer surfaces. ASPN-treated UHMWPE showed extensive fibroblast attachment within 3 h of seeding, whereas fibroblasts did not successfully attach to untreated UHMWPE. Fibroblast-coated surfaces were maintained for up to 28 days, monitoring their metabolic activity and morphology throughout. The chemical properties of the ASPN-treated UHMWPE surface were studied using X-ray photoelectron spectroscopy, revealing the presence of C-N, C=N, and C≡N chemical bonds. The elastic modulus, surface topography, and adhesion properties of the ASPN-treated UHMWPE surface were studied over 28 days during sample storage under ambient conditions and during immersion in two commonly used cell culture media.

Influence of external resonant magnetic perturbation field on edge plasma of small tokamak HYBTOK-II

Energy Technology Data Exchange (ETDEWEB)

Hayashi, Y., E-mail: hayashi-yuki13@ees.nagoya-u.ac.jp [Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603 (Japan); Suzuki, Y.; Ohno, N. [Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603 (Japan); Okamoto, M. [Ishikawa National College of Technology, Kitachujo, Tsubata-cho, Kahoku-gun, Ishikawa 929-0392 (Japan); Kikuchi, Y. [University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2280 (Japan); Sakakibara, S.; Watanabe, K.; Takemura, Y. [National Institute for Fusion Science, 322-6 Oroshi-cho, Toki, Gifu 509-5292 (Japan)

2015-08-15

Radial profile of externally applied resonant magnetic perturbation (RMP) field with mode numbers of m = 6 and n = 2 in a small tokamak device HYBTOK-II have been investigated using a magnetic probe array, which is able to measure the radial profile of magnetic field perturbation induced by applying RMP. Results of RMP penetration into the plasma show that the RMP decreased toward the plasma center, while they were amplified around the resonant surface with a safety factor q = 3 due to the formation of magnetic islands. This suggests that RMP fields for controlling edge plasmas may trigger some kind of MHD instabilities. In addition, simulation results, based on a linearized four-field model, which agrees with the experimental ones, indicates that the penetration and amplification process of RMP strongly depend on a Doppler-shifted frequency between the RMP and plasma rotation.

Microwave plasma enhanced chemical vapor deposition growth of few-walled carbon nanotubes using catalyst derived from an iron-containing block copolymer precursor

International Nuclear Information System (INIS)

Wang Peng; Lu, Jennifer; Zhou, Otto

2008-01-01

The microwave plasma enhanced chemical vapor deposition (MPECVD) method is now commonly used for directional and conformal growth of carbon nanotubes (CNTs) on supporting substrates. One of the shortcomings of the current process is the lack of control of the diameter and diameter distribution of the CNTs due to difficulties in synthesizing well-dispersed catalysts. Recently, block copolymer derived catalysts have been developed which offer the potential of fine control of both the size of and the spacing between the metal clusters. In this paper we report the successful growth of CNTs with narrow diameter distribution using polystyrene-block-polyferrocenylethylmethylsilane (PS-b-PFEMS) as the catalyst precursor. The study shows that higher growth pressure leads to better CNT growth. Besides the pressure, the effects on the growth of CNTs of the growth parameters, such as temperature and precursor gas ratio, are also studied

High excitation of the species in nitrogen–aluminum plasma generated by electron cyclotron resonance microwave discharge of N2 gas and pulsed laser ablation of Al target

International Nuclear Information System (INIS)

Liang, Peipei; Li, Yanli; Cai, Hua; You, Qinghu; Yang, Xu; Huang, Feiling; Sun, Jian; Xu, Ning; Wu, Jiada

2014-01-01

A reactive nitrogen–aluminum plasma generated by electron cyclotron resonance (ECR) microwave discharge of N 2 gas and pulsed laser ablation of an Al target is characterized spectroscopically by time-integrated and time-resolved optical emission spectroscopy (OES). The vibrational and rotational temperatures of N 2 species are determined by spectral simulation. The generated plasma strongly emits radiation from a variety of excited species including ambient nitrogen and ablated aluminum and exhibits unique features in optical emission and temperature evolution compared with the plasmas generated by a pure ECR discharge or by the expansion of the ablation plume. The working N 2 gas is first excited by ECR discharge and the excitation of nitrogen is further enhanced due to the fast expansion of the aluminum plume induced by target ablation, while the excitation of the ablated aluminum is prolonged during the plume expansion in the ECR nitrogen plasma, resulting in the formation of strongly reactive nitrogen–aluminum plasma which contains highly excited species with high vibrational and rotational temperatures. The enhanced intensities and the prolonged duration of the optical emissions of the combined plasma would provide an improved analytical capability for spectrochemical analysis. - Highlights: • ECR discharge and pulsed laser ablation generate highly excited ECR–PLA plasma. • The expansion of PLA plasma results in excitation enhancement of ECR plasma species. • The ECR plasma leads to excitation prolongation of PLA plasma species. • The ECR–PLA plasma emits strong emissions from a variety of excited species. • The ECR–PLA plasma maintains high vibrational–rotational temperatures for a long time

Plasma transport in stochastic magnetic field caused by vacuum resonant magnetic perturbations at diverted tokamak edge

International Nuclear Information System (INIS)

Park, G.; Chang, C. S.; Joseph, I.; Moyer, R. A.

2010-01-01

A kinetic transport simulation for the first 4 ms of the vacuum resonant magnetic perturbations (RMPs) application has been performed for the first time in realistic diverted DIII-D tokamak geometry [J. Luxon, Nucl. Fusion 42, 614 (2002)], with the self-consistent evaluation of the radial electric field and the plasma rotation. It is found that, due to the kinetic effects, the stochastic parallel thermal transport is significantly reduced when compared to the standard analytic model [A. B. Rechester and M. N. Rosenbluth, Phys. Rev. Lett. 40, 38 (1978)] and the nonaxisymmetric perpendicular radial particle transport is significantly enhanced from the axisymmetric level. These trends agree with recent experimental result trends [T. E. Evans, R. A. Moyer, K. H. Burrell et al., Nat. Phys. 2, 419 (2006)]. It is also found, as a side product, that an artificial local reduction of the vacuum RMP fields in the vicinity of the magnetic separatrix can bring the kinetic simulation results to a more detailed agreement with experimental plasma profiles.

Plasma surface interactions in Q-enhanced mirror systems

International Nuclear Information System (INIS)

Post, R.F.

1978-01-01

Two approaches to enhancement of the Q (energy gain) factor of mirror systems are under study at Livermore. These include the Tandem Mirror and the Field Reversed Mirror. Both of these new ideas preserve features of conventional mirror systems as far as plasma-wall interactions are concerned. Specifically in both approaches field lines exit from the ends of the system and impinge on walls located at a distance from the confinement chamber. It is possible to predict some aspects of the plasma/surface interactions of TM and FRM systems from experience obtained in the Livermore 2XIIB experiment. In particular, as observed in 2XIIB, effective isolation of the plasma from thermal contact with the ends owing to the development of sheath-like regions is to be expected. Studies presently underway directed toward still further enhancing the decoupling of the plasma from the effects of plasma surface interactions at the walls will be discussed, with particular reference to the problem of minimizing the effects of refluxing secondary electrons produced by plasma impact on the end walls

Gd-EOB-DTPA-enhanced magnetic resonance imaging features of hepatic hemangioma compared with enhanced computed tomography

OpenAIRE

Tateyama, Akihiro; Fukukura, Yoshihiko; Takumi, Koji; Shindo, Toshikazu; Kumagae, Yuichi; Kamimura, Kiyohisa; Nakajo, Masayuki

2012-01-01

AIM: To clarify features of hepatic hemangiomas on gadolinium-ethoxybenzyl-diethylenetriaminpentaacetic acid (Gd-EOB-DTPA)-enhanced magnetic resonance imaging (MRI) compared with enhanced computed tomography (CT).

Fullerene-rare gas mixed plasmas in an electron cyclotron resonance ion source

Energy Technology Data Exchange (ETDEWEB)

Asaji, T., E-mail: asaji@oshima-k.ac.jp; Ohba, T. [Oshima National College of Maritime Technology, 1091-1 Komatsu, Suo-oshima, Oshima, Yamaguchi 742-2193 (Japan); Uchida, T.; Yoshida, Y. [Bio-Nano Electronics Research Centre, Toyo University, 2100 Kujirai, Kawagoe, Saitama 350-8585 (Japan); Minezaki, H.; Ishihara, S. [Graduate School of Engineering, Toyo University, 2100 Kujirai, Kawagoe, Saitama 350-8585 (Japan); Racz, R.; Biri, S. [Institute of Nuclear Research (ATOMKI), H-4026 Debrecen, Bem Tér 18/c (Hungary); Muramatsu, M.; Kitagawa, A. [National Institute of Radiological Sciences (NIRS), 4-9-1 Anagawa, Inage-ku, Chiba 263-8555 (Japan); Kato, Y. [Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871 (Japan)

2014-02-15

A synthesis technology of endohedral fullerenes such as Fe@C{sub 60} has developed with an electron cyclotron resonance (ECR) ion source. The production of N@C{sub 60} was reported. However, the yield was quite low, since most fullerene molecules were broken in the ECR plasma. We have adopted gas-mixing techniques in order to cool the plasma and then reduce fullerene dissociation. Mass spectra of ion beams extracted from fullerene-He, Ar or Xe mixed plasmas were observed with a Faraday cup. From the results, the He gas mixing technique is effective against fullerene destruction.

Field-aligned plasma-potential structure formed by local electron cyclotron resonance

International Nuclear Information System (INIS)

Hatakeyama, Rikizo; Kaneko, Toshiro; Sato, Noriyoshi

2001-01-01

The significance of basic experiments on field-aligned plasma-potential structure formed by local electron cyclotron resonance (ECR) is claimed based on the historical development of the investigation on electric double layer and electrostatic potential confinement of open-ended fusion-oriented plasmas. In the presence of a single ECR point in simple mirror-type configurations of magnetic field, a potential dip (thermal barrier) appears around this point, being followed by a subsequent potential hump (plug potential) along a collisionless plasma flow. The observed phenomenon gives a clear-cut physics to the formation of field-aligned plug potential with thermal barrier, which is closely related to the double layer formation triggered by a negative dip. (author)

Bio-compatibility, surface and chemical characterization of glow discharge plasma modified ZnO nanocomposite polycarbonate

Energy Technology Data Exchange (ETDEWEB)

Bagra, Bhawna, E-mail: bhawnacct@gmail.com; Pimpliskar, Prashant, E-mail: bhawnacct@gmail.com [Centre for Converging Technologies, University of Rajasthan, Jaipur-302004 (India); Agrawal, Narendra Kumar [Department of Physics, Malaviya National Institute of Technology, Jaipur-302004 (India)

2014-04-24

Bio compatibility is an important issue for synthesis of biomedical devices, which can be tested by bioadoptability and creations of active site to enhance the bacterial/cell growth in biomedical devices. Hence a systematic study was carried out to characterize the effects of Nitrogen ion plasma for creations of active site in nano composite polymer membrane. Nano particles of ZnO are synthesized by chemical root, using solution casting nano composite polymeric membranes were prepared and treated with Nitrogen ion plasma. These membranes were characterized by different technique such as optical microscopy, SEM- Scanning electron microscope, optical transmittance, Fourier transform infrared spectroscopy. Then biocompatibility for membranes was tested by testing of bio-adoptability of membrane.

Controlled density of vertically aligned carbon nanotubes in a triode plasma chemical vapor deposition system

International Nuclear Information System (INIS)

Lim, Sung Hoon; Park, Kyu Chang; Moon, Jong Hyun; Yoon, Hyun Sik; Pribat, Didier; Bonnassieux, Yvan; Jang, Jin

2006-01-01

We report on the growth mechanism and density control of vertically aligned carbon nanotubes using a triode plasma enhanced chemical vapor deposition system. The deposition reactor was designed in order to allow the intermediate mesh electrode to be biased independently from the ground and power electrodes. The CNTs grown with a mesh bias of + 300 V show a density of ∼ 1.5 μm -2 and a height of ∼ 5 μm. However, CNTs do not grow when the mesh electrode is biased to - 300 V. The growth of CNTs can be controlled by the mesh electrode bias which in turn controls the plasma density and ion flux on the sample

Optical and passivating properties of hydrogenated amorphous silicon nitride deposited by plasma enhanced chemical vapour deposition for application on silicon solar cells

Energy Technology Data Exchange (ETDEWEB)

Wight, Daniel Nilsen

2008-07-01

Within this thesis, several important subjects related to the use of amorphous silicon nitride made by plasma enhanced chemical vapour deposition as an anti-reflective coating on silicon solar cells are presented. The first part of the thesis covers optical simulations to optimise single and double layer anti-reflective coatings with respect to optical performance when situated on a silicon solar cell. The second part investigates the relationship between important physical properties of silicon nitride films when deposited under different conditions. The optical simulations were either based on minimising the reflectance off a silicon nitride/silicon wafer stack or maximising the transmittance through the silicon nitride into the silicon wafer. The former method allowed consideration of the reflectance off the back surface of the wafer, which occurs typically at wavelengths above 1000 nm due to the transparency of silicon at these wavelengths. However, this method does not take into consideration the absorption occurring in the silicon nitride, which is negligible at low refractive indexes but quite significant when the refractive index increases above 2.1. For high-index silicon nitride films, the latter method is more accurate as it considers both reflectance and absorbance in the film to calculate the transmittance into the Si wafer. Both methods reach similar values for film thickness and refractive index for optimised single layer anti-reflective coatings, due to the negligible absorption occurring in these films. For double layer coatings, though, the reflectance based simulations overestimated the optimum refractive index for the bottom layer, which would have lead to excessive absorption if applied to real anti-reflective coatings. The experimental study on physical properties for silicon nitride films deposited under varying conditions concentrated on the estimation of properties important for its applications, such as optical properties, passivation

Design study of electron cyclotron resonance-ion plasma accelerator for heavy ion cancer therapy

International Nuclear Information System (INIS)

Inoue, T.; Sugimoto, S.; Sasai, K.; Hattori, T.

2014-01-01

Electron Cyclotron Resonance-Ion Plasma Accelerator (ECR-IPAC) device, which theoretically can accelerate multiple charged ions to several hundred MeV with short acceleration length, has been proposed. The acceleration mechanism is based on the combination of two physical principles, plasma electron ion adiabatic ejection (PLEIADE) and Gyromagnetic Autoresonance (GYRAC). In this study, we have designed the proof of principle machine ECR-IPAC device and simulated the electromagnetic field distribution generating in the resonance cavity. ECR-IPAC device consisted of three parts, ECR ion source section, GYRAC section, and PLEIADE section. ECR ion source section and PLEIADE section were designed using several multi-turn solenoid coils and sextupole magnets, and GYRAC section was designed using 10 turns coil. The structure of ECR-IPAC device was the cylindrical shape, and the total length was 1024 mm and the maximum diameter was 580 mm. The magnetic field distribution, which maintains the stable acceleration of plasma, was generated on the acceleration center axis throughout three sections. In addition, the electric field for efficient acceleration of electrons was generated in the resonance cavity by supplying microwave of 2.45 GHz

Chemical analysis of plasma-assisted antimicrobial treatment on cotton

International Nuclear Information System (INIS)

Kan, C W; Lam, Y L; Yuen, C W M; Luximon, A; Lau, K W; Chen, K S

2013-01-01

This paper explores the use of plasma treatment as a pretreatment process to assist the application of antimicrobial process on cotton fabric with good functional effect. In this paper, antimicrobial finishing agent, Microfresh Liquid Formulation 9200-200 (MF), and a binder (polyurethane dispersion, Microban Liquid Formulation R10800-0, MB) will be used for treating the cotton fabric for improving the antimicrobial property and pre-treatment of cotton fabric by plasma under atmospheric pressure will be employed to improve loading of chemical agents. The chemical analysis of the treated cotton fabric will be conducted by Fourier transform Infrared Spectroscopy.

Resonance Raman spectroscopy of volatile organics -- Carbon tetrachloride

International Nuclear Information System (INIS)

Barletta, R.E.; Veligdan, J.T.

1994-09-01

Volatile organic chemicals are a class of pollutants which are regulated at very low levels by the EPA. Consequently a need exists as a part of site remediation efforts within DOE to develop technologies which will allow for the in situ monitoring of these chemicals. Resonance Raman spectroscopy is a potential technique to accomplish this if the resonance enhancement is sufficiently high. Carbon tetrachloride was selected as a test case. Measurements under resonance conditions at 248 nm showed an enhancement factor of 2 x 10 4 . Using this value an estimate of the sensitivity for both in situ and remote monitoring of CCl 4 was made. It was concluded that resonance Raman could be used to detect these chemicals at levels of regulatory interest. Future effort directed towards the development of a suitable probe as well as a field-portable system would be desirable. Such effort could be directed towards the solution of a particular monitoring problem within a DOE waste remediation project. Once developed, however, it should be easily generalized to the analysis of other VOC's in other environments

Diamond growth on Fe-Cr-Al alloy by H2-plasma enhanced graphite etching

International Nuclear Information System (INIS)

Li, Y. S.; Hirose, A.

2007-01-01

Without intermediate layer and surface pretreatment, adherent diamond films with high initial nucleation density have been deposited on Fe-15Cr-5Al (wt. %) alloy substrate. The deposition was performed using microwave hydrogen plasma enhanced graphite etching in a wide temperature range from 370 to 740 degree sign C. The high nucleation density and growth rate of diamond are primarily attributed to the unique precursors used (hydrogen plasma etched graphite) and the chemical nature of the substrate. The improvement in diamond adhesion to steel alloys is ascribed to the important role played by Al, mitigation of the catalytic function of iron by suppressing the preferential formation of loose graphite intermediate phase on steel surface

Symptomatic ventricular tachyarrhythmia is associated with delayed gadolinium enhancement in cardiac magnetic resonance imaging and with elevated plasma brain natriuretic peptide level in hypertrophic cardiomyopathy

International Nuclear Information System (INIS)

Oka, Katsumi; Tsujino, Takeshi; Nakao, Shinji; Lee-Kawabata, Masaaki; Ezumi, Akira; Masai, Miho; Ohyanagi, Mitsumasa; Masuyama, Tohru

2008-01-01

Delayed gadolinium enhancement (DGE) in cardiac magnetic resonance (CMR) imaging indicates the areas with myocardial fibrosis, which are suggested to be arrhythmogenic substrate in hypertrophic cardiomyopathy (HCM). Elevated brain natriuretic peptide (BNP) is associated with cardiovascular events in HCM. We investigated the grade of DGE in CMR and plasma BNP levels in HCM patients with or without symptomatic ventricular tachycardia (VT) or ventricular fibrillation (VF). We recruited 26 consecutive untreated HCM patients without any symptoms of heart failure. They were divided into 2 groups: patients with symptomatic VT/VF [VT/VF (+) group, n=6]; patients without symptomatic VT/VF [VT/VF (-) group, n=20]. CMR was performed to evaluate left ventricular geometry and the grade of DGE. Plasma BNP levels, left ventricular mass index, and the number of segments with positive DGE were greater in the VT/VF (+) group than in the VT/VF (-) group (698.1±387.6 vs. 226.9±256.8 pg/ml, p=0.006; 152.3±49.5 vs. 89.5±24.1 g/m 2 , p=0.003; 9.7±5.7 vs. 3.5±3.3, p=0.013). On logistic regression, adjusted odds ratio for symptomatic VT/VF was 214 for log BNP (95% confidence interval [CI] 1.2-37,043, p=0.04) and 1.54 for DGE score (95% CI 1.01-2.34, p=0.04). High plasma BNP levels and the enlarged area of DGE in CMR were associated with symptomatic ventricular tachyarrhythmia. These factors may be useful markers for detecting high-risk patients of sudden cardiac death in HCM. (author)

A Resonant Scanning Dipole-Antenna Probe for Enhanced Nanoscale Imaging

NARCIS (Netherlands)

Neumann, L.; van 't Oever, Jan Joannes Frederik; van Hulst, N.F.

2013-01-01

We present a scanning antenna probe that provides 35 nm optical hotspots with a 16-fold excitation enhancement. A resonant optical antenna, tuned to operation in the visible, is carved into the aluminum-coated scanning probe. The antenna resonances, field localization, excitation, and polarization

Pre-Excitation Studies for Rubidium-Plasma Generation

CERN Document Server

Aladi, M; Barna, I.F.; Czitrovszky, Aladar; Djotyan, Gagik; Dombi, Peter; Dzsotjan, David; FöLdes, Istvan; Hamar, Gergo; Ignacz, Peter; Kedves, Miklos; Kerekes, Attila; Levai, Peter; Marton, Istvan; Nagy, Attila; Oszetzky, Daniel; Pocsai, Mihaly; Racz, Peter; Raczkevi, Bela; Szigeti, Janos; Sörlei, Zsuzsa; Szipöcs, Robert; Varga, Dezso; Varga-Umbrich, Karoly; Varro, Sandor; Vamos, Lenard; Vesztergombi, György

2014-01-01

The key element in the Proton-Driven-Plasma-Wake-Field-Accelerator (AWAKE) project is the generation of highly uniform plasma from Rubidium vapor. The standard way to achieve full ionization is to use high power laser which can assure the over-barrier-ionization (OBI) along the 10 meters long active region. The Wigner-team in Budapest is investigating an alternative way of uniform plasma generation. The proposed Resonance Enhanced Multi Photon Ionization (REMPI) scheme probably can be realized by much less laser power. In the following the resonant pre-excitations of the Rb atoms are investigated, theoretically and the status report about the preparatory work on the experiment are presented.

Plasma potential in a magnetic mirror with electron-cyclotron-resonance heating

International Nuclear Information System (INIS)

Smith, P.K.

1983-01-01

Experimental and theoretical studies of the ECRH plasma in the University of Wisconsin DE Machine magnetic mirror have been undertaken. Typical plasma parameters in these experiments were T/sub e/ - 10 to 30 eV, T/sub i/ - 4 eV, V/sub po/ (plasma potential at midplane) - 20 to 50 V, midplane plasma density n 0 - 10 16 m - 3 , B 0 (magnetic field strength on axis at midplane) - .005 to .01 T, mirror ratio R - 5 to 20. The principal experimental findings were the appearance of strong density peaks (approx. 2 x background) and notable V/sub f/ dips (approx. kT/sub e//e) in a narrow (approx. 1 cm) region near the axial positions of cyclotron resonance. The properties of these dips do not change greatly over the range of operating parameters, but are narrower at higher pressures

Formation of ECR Plasma in a Dielectric Plasma Guide under Self-Excitation of a Standing Ion-Acoustic Wave

Science.gov (United States)

Balmashnov, A. A.; Kalashnikov, A. V.; Kalashnikov, V. V.; Stepina, S. P.; Umnov, A. M.

2018-01-01

The formation of a spatially localized plasma with a high brightness has been experimentally observed in a dielectric plasma guide under the electron cyclotron resonance discharge at the excitation of a standing ion-acoustic wave. The results obtained show the possibility of designing compact high-intensity radiation sources with a spectrum determined by the working gas or gas mixture type, high-intensity chemically active particle flow sources, and plasma thrusters for correcting orbits of light spacecraft.

Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods

Energy Technology Data Exchange (ETDEWEB)

Tanaka, Yoriko; Furuta, Masahiro; Kuriyama, Koichi; Kuwabara, Ryosuke; Katsuki, Yukiko [Division of Environmental Science and Engineering, Graduate School of Science and Engineering, Yamaguchi University, 1677-1 Yoshida, Yamaguchi-shi, Yamaguchi 753-8512 (Japan); Kondo, Takeshi [Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda 278-8510 (Japan); Fujishima, Akira [Kanagawa Advanced Science and Technology (KAST), 3-2-1, Sakato, Takatsu-ku, Kawasaki-shi, Kanagawa 213-0012 (Japan); Honda, Kensuke, E-mail: khonda@yamaguchi-u.ac.j [Division of Environmental Science and Engineering, Graduate School of Science and Engineering, Yamaguchi University, 1677-1 Yoshida, Yamaguchi-shi, Yamaguchi 753-8512 (Japan)

2011-01-01

Nitrogen-doped hydrogenated amorphous carbon thin films (a-C:N:H, N-doped DLC) were synthesized with microwave-assisted plasma-enhanced chemical vapor deposition widely used for DLC coating such as the inner surface of PET bottles. The electrochemical properties of N-doped DLC surfaces that can be useful in the application as an electrochemical sensor were investigated. N-doped DLC was easily fabricated using the vapor of nitrogen contained hydrocarbon as carbon and nitrogen source. A N/C ratio of resulting N-doped DLC films was 0.08 and atomic ratio of sp{sup 3}/sp{sup 2}-bonded carbons was 25/75. The electrical resistivity and optical gap were 0.695 {Omega} cm and 0.38 eV, respectively. N-doped DLC thin film was found to be an ideal polarizable electrode material with physical stability and chemical inertness. The film has a wide working potential range over 3 V, low double-layer capacitance, and high resistance to electrochemically induced corrosion in strong acid media, which were the same level as those for boron-doped diamond (BDD). The charge transfer rates for the inorganic redox species, Fe{sup 2+/3+} and Fe(CN){sub 6}{sup 4-/3-} at N-doped DLC were sufficiently high. The redox reaction of Ce{sup 2+/3+} with standard potential higher than H{sub 2}O/O{sub 2} were observed due to the wider potential window. At N-doped DLC, the change of the kinetics of Fe(CN){sub 6}{sup 3-/4-} by surface oxidation is different from that at BDD. The rate of Fe(CN){sub 6}{sup 3-/4-} was not varied before and after oxidative treatment on N-doped DLC includes sp{sup 2} carbons, which indicates high durability of the electrochemical activity against surface oxidation.

4d--4f emission resonances in laser-produced plasmas

International Nuclear Information System (INIS)

O'Sullivan, G.; Carroll, P.K.

1981-01-01

Using targets containing compounds of the elements cesium through lutetium, we studied the spectra of laser-produced plasmas in the grazing-incidence region from 40 to 200 A. The spectra are characterized by strong regions of resonancelike emission extending typically over 9--18 eV. With increasing Z, the spectra show certain systematic variations in character and move monotonically toward shorter wavelengths. From a collisional-radiative plasma model, the ion stages responsible for the emision are identified as VIII through XVI. The resonances are attributed to 4-4f transitions that, because Dn = 0, tend to overlap for different ion stages of the same element

Electron cyclotron resonance ion source plasma characterization by X-ray spectroscopy and X-ray imaging

Energy Technology Data Exchange (ETDEWEB)

Mascali, David, E-mail: davidmascali@lns.infn.it; Castro, Giuseppe; Celona, Luigi; Neri, Lorenzo; Gammino, Santo [INFN–Laboratori Nazionali del Sud, Via S. Sofia 62, 95125 Catania (Italy); Biri, Sándor; Rácz, Richárd; Pálinkás, József [Institute for Nuclear Research (Atomki), Hungarian Academy of Sciences, Bem tér 18/c, H-4026 Debrecen (Hungary); Caliri, Claudia [INFN–Laboratori Nazionali del Sud, Via S. Sofia 62, 95125 Catania (Italy); Università degli Studi di Catania, Dip.to di Fisica e Astronomia, via Santa Sofia 64, 95123 Catania (Italy); Romano, Francesco Paolo [INFN–Laboratori Nazionali del Sud, Via S. Sofia 62, 95125 Catania (Italy); CNR, Istituto per i Beni Archeologici e Monumentali, Via Biblioteca 4, 95124 Catania (Italy); Torrisi, Giuseppe [INFN–Laboratori Nazionali del Sud, Via S. Sofia 62, 95125 Catania (Italy); Università Mediterranea di Reggio Calabria, DIIES, Via Graziella, I-89100 Reggio Calabria (Italy)

2016-02-15

An experimental campaign aiming to investigate electron cyclotron resonance (ECR) plasma X-ray emission has been recently carried out at the ECRISs—Electron Cyclotron Resonance Ion Sources laboratory of Atomki based on a collaboration between the Debrecen and Catania ECR teams. In a first series, the X-ray spectroscopy was performed through silicon drift detectors and high purity germanium detectors, characterizing the volumetric plasma emission. The on-purpose developed collimation system was suitable for direct plasma density evaluation, performed “on-line” during beam extraction and charge state distribution characterization. A campaign for correlating the plasma density and temperature with the output charge states and the beam intensity for different pumping wave frequencies, different magnetic field profiles, and single-gas/gas-mixing configurations was carried out. The results reveal a surprisingly very good agreement between warm-electron density fluctuations, output beam currents, and the calculated electromagnetic modal density of the plasma chamber. A charge-coupled device camera coupled to a small pin-hole allowing X-ray imaging was installed and numerous X-ray photos were taken in order to study the peculiarities of the ECRIS plasma structure.

Enhanced discreteness, renormalization, and anomalous transport in turbulent plasma. Final technical report, 15 September 1991--14 September 1992

International Nuclear Information System (INIS)

Johnston, S.

1997-01-01

The Principal Investigator, Professor Shayne Johnston, devoted 25% of his time during the academic year 1991--92 to this grant. The central idea underlying this project was a renormalized vision of a turbulent plasma in which electrons become microclumps, discreteness is thereby enhanced,and transport processes, still essentially classical, become anomalous. After two years of continued investigation, the PI believes strongly that this vision remains viable and compelling as an approach to electron heat conduction in the tokamak core. The simple analysis presented below shows that electrostatic waves can indeed correlate resonant repelling particles on length scales much shorter than a wavelength, thus causing enhanced discreteness within Debye clouds

Applying chemical engineering concepts to non-thermal plasma reactors

Science.gov (United States)

Pedro AFFONSO, NOBREGA; Alain, GAUNAND; Vandad, ROHANI; François, CAUNEAU; Laurent, FULCHERI

2018-06-01

Process scale-up remains a considerable challenge for environmental applications of non-thermal plasmas. Undersanding the impact of reactor hydrodynamics in the performance of the process is a key step to overcome this challenge. In this work, we apply chemical engineering concepts to analyse the impact that different non-thermal plasma reactor configurations and regimes, such as laminar or plug flow, may have on the reactor performance. We do this in the particular context of the removal of pollutants by non-thermal plasmas, for which a simplified model is available. We generalise this model to different reactor configurations and, under certain hypotheses, we show that a reactor in the laminar regime may have a behaviour significantly different from one in the plug flow regime, often assumed in the non-thermal plasma literature. On the other hand, we show that a packed-bed reactor behaves very similarly to one in the plug flow regime. Beyond those results, the reader will find in this work a quick introduction to chemical reaction engineering concepts.

Enhanced nuclear level decay in hot dense plasmas

International Nuclear Information System (INIS)

Gosselin, G.; Morel, P.

2004-01-01

A model of nuclear level decay in a plasma environment is described. Nuclear excitation and decay by photon processes, nuclear excitation by electron capture, and decay by internal conversion are taken into account. The electrons in the plasma are described by a relativistic average atom model for the bound electrons and by a relativistic Thomas-Fermi-Dirac model for the free electrons. Nuclear decay of isomeric level may be enhanced through an intermediate level lying above the isomer. An enhanced nuclear decay rate may occur for temperatures far below the excitation energy of the transition to the intermediate level. In most cases, the enhancement factor may reach several decades

Effect of Radio-Frequency and Low-Frequency Bias Voltage on the Formation of Amorphous Carbon Films Deposited by Plasma Enhanced Chemical Vapor Deposition

International Nuclear Information System (INIS)

Manis-Levy, Hadar; Mintz, Moshe H.; Livneh, Tsachi; Zukerman Ido; Raveh, Avi

2014-01-01

The effect of radio-frequency (RF) or low-frequency (LF) bias voltage on the formation of amorphous hydrogenated carbon (a-C:H) films was studied on silicon substrates with a low methane (CH 4 ) concentration (2–10 vol.%) in CH 4 +Ar mixtures. The bias substrate was applied either by RF (13.56 MHz) or by LF (150 kHz) power supply. The highest hardness values (∼18–22 GPa) with lower hydrogen content in the films (∼20 at.%) deposited at 10 vol.% CH 4 , was achieved by using the RF bias. However, the films deposited using the LF bias, under similar RF plasma generation power and CH 4 concentration (50 W and 10 vol.%, respectively), displayed lower hardness (∼6–12 GPa) with high hydrogen content (∼40 at.%). The structures analyzed by Fourier Transform Infrared (FTIR) and Raman scattering measurements provide an indication of trans-polyacetylene structure formation. However, its excessive formation in the films deposited by the LF bias method is consistent with its higher bonded hydrogen concentration and low level of hardness, as compared to the film prepared by the RF bias method. It was found that the effect of RF bias on the film structure and properties is stronger than the effect of the low-frequency (LF) bias under identical radio-frequency (RF) powered electrode and identical PECVD (plasma enhanced chemical vapor deposition) system configuration. (plasma technology)

Exploring the chemical enhancement for surface-enhanced Raman scattering with Au bowtie nanoantennas

International Nuclear Information System (INIS)

Fromm, David P.; Sundaramurthy, Arvind; Kinkhabwala, Anika; Schuck, P. James; Kino, Gordon S.; Moerner, W.E.

2006-01-01

Single metallic bowtie nanoantennas provide a controllable environment for surface-enhanced Raman scattering (SERS) of adsorbed molecules. Bowties have experimentally measured electromagnetic enhancements, enabling estimation of chemical enhancement for both the bulk and the few-molecule regime. Strong fluctuations of selected Raman lines imply that a small number of p-mercaptoaniline molecules on a single bowtie show chemical enhancement >10 7 , much larger than previously believed, likely due to charge transfer between the Au surface and the molecule. This chemical sensitivity of SERS has significant implications for ultra-sensitive detection of single molecules

Electrical characteristics of thermal CVD B-doped Si films on highly strained Si epitaxially grown on Ge(100) by plasma CVD without substrate heating

International Nuclear Information System (INIS)

Sugawara, Katsutoshi; Sakuraba, Masao; Murota, Junichi

2010-01-01

Using an 84% relaxed Ge(100) buffer layer formed on Si(100) by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition (CVD), influence of strain upon electrical characteristics of B-doped Si film epitaxially grown on the Ge buffer have been investigated. For the thinner B-doped Si film, surface strain amount is larger than that of the thicker film, for example, strain amount reaches 2.0% for the thickness of 2.2 nm. It is found that the hole mobility is enhanced by the introduction of strain to Si, and the maximum enhancement of about 3 is obtained. This value is higher than that of the usually reported mobility enhancement by strain using Si 1 -x Ge x buffer. Therefore, introduction of strain using relaxed Ge film formed by ECR plasma enhanced CVD is useful to improve future Si-based device performance.

Effect of pulse slippage on resonant second harmonic generation of a short pulse laser in a plasma

International Nuclear Information System (INIS)

Nitikant; Sharma, A K

2004-01-01

The process of second harmonic generation of an intense short pulse laser in a plasma is resonantly enhanced by the application of a magnetic wiggler. The wiggler of suitable wave number k-vector 0 provides necessary momentum to second harmonic photons to make harmonic generation a resonant process. The laser imparts an oscillatory velocity to electrons and exerts a longitudinal ponderomotive force on them at (2ω 1 ,2k-vector 1 ), where ω 1 and k-vector 1 are the frequency and the wave number of the laser, respectively. As the electrons acquire oscillatory velocity at the second harmonic, the wiggler magnetic field beats with it to produce a transverse second harmonic current at (2ω 1 ,2k-vector 1 +k-vector 0 ), driving the second harmonic electromagnetic radiation. However, the group velocity of the second harmonic wave is greater than that of the fundamental wave, hence, the generated pulse slips out of the main laser pulse and its amplitude saturates

Investigation and application of microwave electron cyclotron resonance plasma physical vapour deposition

International Nuclear Information System (INIS)

Ren Zhaoxing; Sheng Yanya; Shi Yicai; Wen Haihu; Cao Xiaowen

1991-06-01

The evaporating deposition of Ti film and Cu film by using microwave electron cyclotron resonance (ECR) technique was investigated. It deposition rate was about 50 nm/min and the temperature of the substrate was 50∼150 deg C. The thin amorphous films with strong adherent force were obtained. The sputtering deposition with ECR plasma was studied by employing higher plasma density and ionicity and negative substrate potential to make YBaCuO superconducting film. Its film was compact and amorphous with a thickness of 1.0 μm and the deposition rate was about 10 nm/min. The results show that this technique can initiate a high density and high ionicity plasma at lower gas pressure (10 -2 ∼10 -3 Pa). This plasma is the most suitable plasma source in thin film deposition process and surface treatment technique

Application of laser resonance scattering to the study of high-temperature plasma-wall interaction

International Nuclear Information System (INIS)

Maeda, Mitsuo; Muraoka, Katsunori; Hamamoto, Makoto; Akazaki, Masanori; Miyazoe, Yasushi

1981-01-01

Studies on laser resonance scattering and its application to the study of high-temperature plasma-wall interaction are reviewed. The application of dye laser beam to resonant scattering method has been developed. This method is able to detect low density atoms. The fluorescent photon counts can be estimated for a two-level system and a three-level system. The S/N ratio, Which is in close connection with the detection limit, has been estimated. The doppler effect due to the thermal motion of atoms is taken into consideration. The calibration of the absolute number of atoms is necessary. Tunable coherent light is used as the light source for resonance scattering method. This is able to excite atoms strongly and to increase the detection efficiency. As dye lasers, a N 2 laser, a YAG laser, and a KrF excimer laser have been studied. In VUV region, rare gas or rare gas halide lasers can be used. The strong output power can be expected when the resonance lines of atoms meet the synchronizing region of the excimer laser. The resonance scattering method is applied to the detection of impurity metal atoms in plasma. The studies of laser systems for the detection of hydrogen atoms are also in progress. (Kato, T.)

Optical bio-chemical sensors on SNOW ring resonators

Science.gov (United States)

Khorasaninejad, Mohammadreza; Clarke, Nigel; Anantram, M. P.; Singh Saini, Simarjeet

2011-08-01

In this paper, we propose and analyze novel ring resonator based bio-chemical sensors on silicon nanowire optical waveguide (SNOW) and show that the sensitivity of the sensors can be increased by an order of magnitude as compared to silicon-on-insulator based ring resonators while maintaining high index contrast and compact devices. The core of the waveguide is hollow and allows for introduction of biomaterial in the center of the mode, thereby increasing the sensitivity of detection. A sensitivity of 243 nm/refractive index unit (RIU) is achieved for a change in bulk refractive index. For surface attachment, the sensor is able to detect monolayer attachments as small as 1 Å on the surface of the silicon nanowires.

Chemical solution synthesis and ferromagnetic resonance of epitaxial thin films of yttrium iron garnet

Science.gov (United States)

Lucas, Irene; Jiménez-Cavero, Pilar; Vila-Fungueiriño, J. M.; Magén, Cesar; Sangiao, Soraya; de Teresa, José Maria; Morellón, Luis; Rivadulla, Francisco

2017-12-01

We report the fabrication of epitaxial Y3F e5O12 (YIG) thin films on G d3G a5O12 (111) using a chemical solution method. Cubic YIG is a ferrimagnetic material at room temperature, with excellent magneto-optical properties, high electrical resistivity, and a very narrow ferromagnetic resonance, which makes it particularly suitable for applications in filters and resonators at microwave frequencies. But these properties depend on the precise stoichiometry and distribution of F e3 + ions among the octahedral/tetrahedral sites of a complex structure, which hampered the production of high-quality YIG thin films by affordable chemical methods. Here we report the chemical solution synthesis of YIG thin films, with excellent chemical, crystalline, and magnetic homogeneity. The films show a very narrow ferromagnetic resonance (long spin relaxation time), comparable to that obtained from high-vacuum physical deposition methods. These results demonstrate that chemical methods can compete to develop nanometer-thick YIG films with the quality required for spintronic devices and other high-frequency applications.

Characterization of the enhancing lesions on dynamic contrast enhanced magnetic resonance imaging in patients with interstitial mammoplasty

International Nuclear Information System (INIS)

Kim, Tae Yun; Kim, Sung Hun; Kang, Bong Joo; Kim, Hyeon Sook; Cha, Eun Suk; Kim, Ji Youn; Song, Byung Joo

2013-01-01

Purpose: The purpose of this study was to categorize the morphologic and kinetic features of enhancing lesions in breasts with interstitial mammoplasty using dynamic contrast-enhanced magnetic resonance imaging and to assess factors predictive of breast cancer. Materials and methods: We retrospectively reviewed the clinical and radiological data of 21 enhancing lesions in 19 patients with interstitial mammoplasty, who underwent breast magnetic resonance imaging and biopsy or an operation in our hospital from September 2008 to July 2012. These lesions were sorted by morphological and kinetic features and final assessment category according to the BI-RADS lexicon. Results: Nine cases were confirmed to be ductal carcinoma in situ (n = 2) and invasive ductal carcinoma (n = 7), and the remaining 12 cases were fibrocystic disease (n = 2), fibroadenoma (n = 2), fat necrosis (n = 1), foreign body granuloma (n = 3) and silicone mastitis (n = 1). Common features of malignancy included irregular shape (50.0%), spiculated margins (75.0%), heterogeneous enhancement (50.0%) and type III kinetic pattern (87.5%). The correlations of margins and kinetic curve pattern with benignity and malignancy approached statistical significance (p = 0.02, respectively). We found no correlation for shape (p = 0.33) or internal enhancement (p = 0.42) between lesion types. The malignancy rate of enhancing lesions was 42.8% (9/21). The sensitivity and specificity of dynamic contrast-enhanced magnetic resonance imaging were 100% and 16.67%, respectively. The positive predictive value, negative predictive value and accuracy of magnetic resonance imaging were 47.38%, 100% and 52.38%. Overall inter-observer agreement for the kinetic curve pattern was good (κ = 0.67). Moderate agreement was seen in describing the shape, margin, enhancement and assessing the final category (κ = 0.59, 0.46, 0.58 and 0.49, respectively). Conclusion: Dynamic contrast-enhanced magnetic resonance imaging had a high

Characterization of the enhancing lesions on dynamic contrast enhanced magnetic resonance imaging in patients with interstitial mammoplasty

Energy Technology Data Exchange (ETDEWEB)

Kim, Tae Yun [Department of Radiology, Seoul St. Mary' s Hospital, The Catholic University of Korea (Korea, Republic of); Kim, Sung Hun, E-mail: rad-ksh@catholic.ac.kr [Department of Radiology, Seoul St. Mary' s Hospital, The Catholic University of Korea (Korea, Republic of); Kang, Bong Joo [Department of Radiology, Seoul St. Mary' s Hospital, The Catholic University of Korea (Korea, Republic of); Kim, Hyeon Sook [Department of Radiology, St. Paul Hospital, The Catholic University of Korea (Korea, Republic of); Cha, Eun Suk [Department of Radiology, Ewha Womans University, School of Medicine, Mokdong Hospital (Korea, Republic of); Kim, Ji Youn [Department of Radiology, Yeouido St. Mary' s Hospital, The Catholic University of Korea (Korea, Republic of); Song, Byung Joo [Department of Surgery, Seoul St. Mary' s Hospital, The Catholic University of Korea, Seoul (Korea, Republic of)

2013-12-01

Purpose: The purpose of this study was to categorize the morphologic and kinetic features of enhancing lesions in breasts with interstitial mammoplasty using dynamic contrast-enhanced magnetic resonance imaging and to assess factors predictive of breast cancer. Materials and methods: We retrospectively reviewed the clinical and radiological data of 21 enhancing lesions in 19 patients with interstitial mammoplasty, who underwent breast magnetic resonance imaging and biopsy or an operation in our hospital from September 2008 to July 2012. These lesions were sorted by morphological and kinetic features and final assessment category according to the BI-RADS lexicon. Results: Nine cases were confirmed to be ductal carcinoma in situ (n = 2) and invasive ductal carcinoma (n = 7), and the remaining 12 cases were fibrocystic disease (n = 2), fibroadenoma (n = 2), fat necrosis (n = 1), foreign body granuloma (n = 3) and silicone mastitis (n = 1). Common features of malignancy included irregular shape (50.0%), spiculated margins (75.0%), heterogeneous enhancement (50.0%) and type III kinetic pattern (87.5%). The correlations of margins and kinetic curve pattern with benignity and malignancy approached statistical significance (p = 0.02, respectively). We found no correlation for shape (p = 0.33) or internal enhancement (p = 0.42) between lesion types. The malignancy rate of enhancing lesions was 42.8% (9/21). The sensitivity and specificity of dynamic contrast-enhanced magnetic resonance imaging were 100% and 16.67%, respectively. The positive predictive value, negative predictive value and accuracy of magnetic resonance imaging were 47.38%, 100% and 52.38%. Overall inter-observer agreement for the kinetic curve pattern was good (κ = 0.67). Moderate agreement was seen in describing the shape, margin, enhancement and assessing the final category (κ = 0.59, 0.46, 0.58 and 0.49, respectively). Conclusion: Dynamic contrast-enhanced magnetic resonance imaging had a high

The Surface Interface Characteristics of Vertically Aligned Carbon Nanotube and Graphitic Carbon Fiber Arrays Grown by Thermal and Plasma Enhanced Chemical Vapor Deposition

Science.gov (United States)

Delzeit, Lance; Nguyen, Cattien; Li, Jun; Han, Jie; Meyyappan, M.

2002-01-01

The development of nano-arrays for sensors and devices requires the growth of arrays with the proper characteristics. One such application is the growth of vertically aligned carbon nanotubes (CNTs) and graphitic carbon fibers (GCFs) for the chemical attachment of probe molecules. The effectiveness of such an array is dependent not only upon the effectiveness of the probe and the interface between that probe and the array, but also the array and the underlaying substrate. If that array is a growth of vertically aligned CNTs or GCFs then the attachment of that array to the surface is of the utmost importance. This attachment provides the mechanical stability and durability of the array, as well as, the electrical properties of that array. If the detection is to be acquired through an electrical measurement, then the appropriate resistance between the array and the surface need to be fabricated into the device. I will present data on CNTs and GCFs grown from both thermal and plasma enhanced chemical vapor deposition. The focus will be on the characteristics of the metal film from which the CNTs and GCFs are grown and the changes that occur due to changes within the growth process.

Influence of Substrate Biasing on (Ba,Sr)TiO3 Films Prepared by Electron Cyclotron Resonance Plasma Sputtering

Science.gov (United States)

Matsumoto, Takeshi; Niino, Atsushi; Ohtsu, Yasunori; Misawa, Tatsuya; Yonesu, Akira; Fujita, Hiroharu; Miyake, Shoji

2004-03-01

(Ba,Sr)TiO3 (BST) films were deposited by electron cyclotron resonance (ECR) plasma sputtering with mirror confinement. DC bias voltage was applied to Pt/Ti/SiO2/Si substrates during deposition to vary the intensity of bombardment of energetic ions and to modify film properties. BST films deposited on the substrates at floating potential (approximately +20 V) were found to be amorphous, while films deposited on +40 V-biased substrates were crystalline in spite of a low substrate temperature below 648 K. In addition, atomic diffusion, which causes deterioration in the electrical properties of the films, was hardly observed in the crystallized films deposited with +40 V bias perhaps due to the low substrate temperature. Plasma diagnoses revealed that application of a positive bias to the substrate reduced the energy of ion bombardment and increased the density of excited neutral particles, which was assumed to result in the promotion of chemical reactions during deposition and the crystallization of BST films at a low temperature.

Impact of rotating resonant magnetic perturbation fields on plasma edge electron density and temperature

International Nuclear Information System (INIS)

Stoschus, H.; Schmitz, O.; Frerichs, H.; Reiser, D.; Unterberg, B.; Lehnen, M.; Reiter, D.; Samm, U.; Jakubowski, M.W.

2012-01-01

Rotating resonant magnetic perturbation (RMP) fields impose a characteristic modulation to the edge electron density n e (r, t) and temperature T e (r, t) fields, which depends on the relative rotation f rel between external RMP field and plasma fluid. The n e (r, t) and T e (r, t) fields measured in the edge (r/a = 0.9–1.05) of TEXTOR L-mode plasmas are in close correlation with the local magnetic vacuum topology for low relative rotation f rel = −0.2 kHz. In comparison with the 3D neutral and plasma transport code EMC3-Eirene, this provides substantial experimental evidence that for low relative rotation level and high resonant field amplitudes (normalized radial field strength B r 4/1 /B t =2×10 -3 ), a stochastic edge with a remnant island chain dominated by diffusive transport exists. Radially outside a helical scrape-off layer, the so-called laminar zone embedded into a stochastic domain is found to exist. In contrast for high relative rotation of f rel = 1.8 kHz, the measured modulation of n e is shifted by π/2 toroidally with respect to the modelled vacuum topology. A pronounced flattening in T e (r) and a reduction in n e (r) is measured at the resonant flux surface and represents a clear signature for a magnetic island, which is phase shifted with respect to the vacuum island position. A correlated shift of the laminar zone radially outwards at the very plasma edge is observed suggesting that the actual near-field structure at the perturbation source is determined by the plasma response as well. (paper)

Enhancement of four-wave mixing induced by interacting dark resonances

International Nuclear Information System (INIS)

Yang Weifeng; Gong Shangqing; Niu Yueping; Jin Shiqi; Xu Zhizhan

2005-01-01

We analyse a four-wave mixing (FWM) scheme in a five-level atomic system in which double-dark resonances are present. It is found that the enhancement of FWM in both electromagnetically induced transparency (EIT) windows can be obtained even without the condition of multiphoton resonance. Moreover, the conversion efficiency of FWM in one EIT window can be much larger than that in the other due to the presence of interacting dark resonances

Surface plasmon enhanced interfacial electron transfer and resonance Raman, surface-enhanced resonance Raman studies of cytochrome C mutants

Energy Technology Data Exchange (ETDEWEB)

Zheng, Junwei [Iowa State Univ., Ames, IA (United States)

1999-11-08

Surface plasmon resonance was utilized to enhance the electron transfer at silver/solution interfaces. Photoelectrochemical reductions of nitrite, nitrate, and CO₂ were studied on electrochemically roughened silver electrode surfaces. The dependence of the photocurrent on photon energy, applied potential and concentration of nitrite demonstrates that the photoelectrochemical reduction proceeds via photoemission process followed by the capture of hydrated electrons. The excitation of plasmon resonances in nanosized metal structures resulted in the enhancement of the photoemission process. In the case of photoelectrocatalytic reduction of CO₂, large photoelectrocatalytic effect for the reduction of CO₂ was observed in the presence of surface adsorbed methylviologen, which functions as a mediator for the photoexcited electron transfer from silver metal to CO₂ in solution. Photoinduced reduction of microperoxidase-11 adsorbed on roughened silver electrode was also observed and attributed to the direct photoejection of free electrons of silver metal. Surface plasmon assisted electron transfer at nanostructured silver particle surfaces was further determined by EPR method.

Model of charge-state distributions for electron cyclotron resonance ion source plasmas

Directory of Open Access Journals (Sweden)

D. H. Edgell

1999-12-01

Full Text Available A computer model for the ion charge-state distribution (CSD in an electron cyclotron resonance ion source (ECRIS plasma is presented that incorporates non-Maxwellian distribution functions, multiple atomic species, and ion confinement due to the ambipolar potential well that arises from confinement of the electron cyclotron resonance (ECR heated electrons. Atomic processes incorporated into the model include multiple ionization and multiple charge exchange with rate coefficients calculated for non-Maxwellian electron distributions. The electron distribution function is calculated using a Fokker-Planck code with an ECR heating term. This eliminates the electron temperature as an arbitrary user input. The model produces results that are a good match to CSD data from the ANL-ECRII ECRIS. Extending the model to 1D axial will also allow the model to determine the plasma and electrostatic potential profiles, further eliminating arbitrary user input to the model.

Obtention of selective membranes for water and hydrophobic liquids by plasma enhanced chemical vapor deposition on porous substrates

International Nuclear Information System (INIS)

Bankovic, P.; Demarquette, N.R.; Silva, M.L.P. da

2004-01-01

In this work, the possibility of obtaining selective membranes for water and hydrophobic liquids by plasma enhanced chemical vapor deposition (PECVD) of hexamethyldisilazane (HMDS) or double layers of HMDS and n-hexane on porous substrates using a capacitive plasma reactor was investigated. The porous substrates used were paper filter, diatomite and polyester textiles. The films were characterized by X-ray photoelectron spectroscopy (XPS), attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR) and contact angle measurements. The membranes obtained were characterized by the Cobb test. Their efficiency to separate hydrocarbon compounds from water was evaluated through filtration experiments and Karl-Fischer titration tests. The reagents used in the filtration experiments were: chloroform, n-hexane, n-heptane, ethyl ether, benzene and diesel. XPS analysis showed that Si, N, C and O were present at the surface of the film. C peak was dominant in the double layer film spectra. C-H n , CH 2 , Si-H, Si-CH 3 , N-H, Si-CH 2 -Si, Si-N-Si and Si-C bonds were identified in both types of the films by ATR-FTIR. The relative intensities of the corresponding peaks in the two spectra were different. The XPS and FTIR results indicated that C was most likely present in a CH n form at the surface of double layer film. The average contact angles formed by drops of water on the film surface ranged from 135 deg. to 155 deg. . Water adsorption measured by Cobb test decreased from average values ranging from 300 to 9000 g m -2 (for nonmodified surfaces) to values ranging from 0 to 20 g m -2 (for treated surfaces). The Karl-Fischer titration indicated that between 90 and 1000 ppm (depending on the reagent used) of water remained in the hydrocarbon compound after filtration

Enhanced Faraday rotation in one dimensional magneto-plasmonic structure due to Fano resonance

Science.gov (United States)

Sadeghi, S.; Hamidi, S. M.

2018-04-01

Enhanced Faraday rotation in a new type of magneto-plasmonic structure with the capability of Fano resonance, has been reported theoretically. A magneto-plasmonic structure composed of a gold corrugated layer deposited on a magneto-optically active layer was studied by means of Lumerical software based on finite-difference time-domain. In our proposed structure, plasmonic Fano resonance and localized surface plasmon have induced enhancement in magneto-optical Faraday rotation. It is shown that the influence of geometrical parameters in gold layer offers a desirable platform for engineering spectral position of Fano resonance and enhancement of Faraday rotation.

Enhancing optical response of graphene through stochastic resonance

Science.gov (United States)

Ying, Lei; Huang, Liang; Lai, Ying-Cheng

2018-04-01

Enhancing the optical response of graphene is a topic of interest with applications in optoelectronics. Subject to light irradiation, graphene can exhibit nontrivial topologically insulating states, effectively turning itself into a Floquet topological insulator due to the time periodicity of the external driving. We find that, when random disorder is present, its interplay with the topologically insulating states can have a dramatic effect on electronic transport through graphene. In particular, we consider the prototypical setting where a graphene nanoribbon is irradiated by circularly polarized light, where the length of the nanoribbon is sufficiently long so that evanescent states have little effect on transport. We uncover a resonance phenomenon in which the conductance is enhanced as the disorder strength is increased from zero, reaches a maximum value for an optimal level of disorder, and decreases as the disorder is strengthened further. With respect to its value at the zero-disorder strength, the maximum conductance value can be as much as 50 % higher. Qualitatively, this can be understood as a result of the dynamical interplay between disorder and Floquet states (channels) generated by light irradiation. Quantitatively, the resonance phenomenon can be explained in the framework of Born theory, where the disorder reorganizes the Floquet Hamiltonian and enhances the effective coupling between the adjacent Floquet conducting channels. That is, disorder is capable of promoting both photon absorption and emission, leading to significant enhancement of nonequilibrium electronic transport. We demonstrate the robustness of the resonance phenomenon by investigating the effects of spatial symmetry breaking on transport and provide an understanding based on analyzing the behavior of the density of states of the Floquet channels.

Comparative Study of Furnace and Flash Lamp Annealed Silicon Thin Films Grown by Plasma Enhanced Chemical Vapor Deposition

Directory of Open Access Journals (Sweden)

Maheshwar Shrestha

2018-03-01

Full Text Available Low-temperature growth of microcrystalline silicon (mc-Si is attractive for many optoelectronic device applications. This paper reports a detailed comparison of optical properties, microstructure, and morphology of amorphous silicon (a-Si thin films crystallized by furnace annealing and flash lamp annealing (FLA at temperatures below the softening point of glass substrate. The initial a-Si films were grown by plasma enhanced chemical vapor deposition (PECVD. Reflectance measurement indicated characteristic peak in the UV region ~280 nm for the furnace annealed (>550 °C and flash lamp annealed films, which provided evidence of crystallization. The film surface roughness increased with increasing the annealing temperature as well as after the flash lamp annealing. X-ray diffraction (XRD measurement indicated that the as-deposited samples were purely amorphous and after furnace crystallization, the crystallites tended to align in one single direction (202 with uniform size that increased with the annealing temperature. On the other hand, the flash lamp crystalized films had randomly oriented crystallites with different sizes. Raman spectroscopy showed the crystalline volume fraction of 23.5%, 47.3%, and 61.3% for the samples annealed at 550 °C, 650 °C, and with flash lamp, respectively. The flash lamp annealed film was better crystallized with rougher surface compared to furnace annealed ones.

Fundamental limits on gas-phase chemical reduction of NOx in a plasma

Energy Technology Data Exchange (ETDEWEB)

Penetrante, B.M.; Hsiao, M.C.; Merritt, B.T.; Vogtlin, G.E. [Lawrence Livermore National Lab., CA (United States)

1997-12-31

In the plasma, the electrons do not react directly with the NOx molecules. The electrons collide mainly with the background gas molecules like N{sub 2}, O{sub 2} and H{sub 2}O. Electron impact on these molecules result partly in dissociation reactions that produce reactive species like N, O and OH. The NOx in the engine exhaust gas initially consist mostly of NO. The ground state nitrogen atom, N, is the only species that could lead to the chemical reduction of NO to N{sub 2}. The O radical oxidizes NO to NO{sub 2} leaving the same amount of NOx. The OH radical converts NO{sub 2} to nitric acid. Acid products in the plasma can easily get adsorbed on surfaces in the plasma reactor and in the pipes. When undetected, the absence of these oxidation products can often be mistaken for chemical reduction of NOx. In this paper the authors will examine the gas-phase chemical reduction of NOx. They will show that under the best conditions, the plasma can chemically reduce 1.6 grams of NOx per brake-horsepower-hour [g(NOx)/bhp-hr] when 5% of the engine output energy is delivered to the plasma.

Fabrication of enhancement-mode AlGaN/GaN high electron mobility transistors using double plasma treatment

Energy Technology Data Exchange (ETDEWEB)

Lim, Jong-Won, E-mail: jwlim@etri.re.kr [Photonic/Wireless Convergence Components Dept., IT Materials and Components Lab., Electronics and Telecommunications Research Institute, Daejeon 305-700 (Korea, Republic of); Ahn, Ho-Kyun; Kim, Seong-il; Kang, Dong-Min; Lee, Jong-Min; Min, Byoung-Gue; Lee, Sang-Heung; Yoon, Hyung-Sup; Ju, Chull-Won; Kim, Haecheon; Mun, Jae-Kyoung; Nam, Eun-Soo [Photonic/Wireless Convergence Components Dept., IT Materials and Components Lab., Electronics and Telecommunications Research Institute, Daejeon 305-700 (Korea, Republic of); Park, Hyung-Moo [Photonic/Wireless Convergence Components Dept., IT Materials and Components Lab., Electronics and Telecommunications Research Institute, Daejeon 305-700 (Korea, Republic of); Division of Electronics and Electrical Engineering, Dongguk University, Seoul (Korea, Republic of)

2013-11-29

We report the fabrication and DC and microwave characteristics of 0.5 μm AlGaN/GaN high electron mobility transistors using double plasma treatment process. Silicon nitride layers 700 and 150 Å thick were deposited by plasma-enhanced chemical vapor deposition at 260 °C to protect the device and to define the gate footprint. The double plasma process was carried out by two different etching techniques to obtain enhancement-mode AlGaN/GaN high electron mobility transistors with 0.5 μm gate lengths. The enhancement-mode AlGaN/GaN high electron mobility transistor was prepared in parallel to the depletion-mode AlGaN/GaN high electron mobility transistor device on one wafer. Completed double plasma treated 0.5 μm AlGaN/GaN high electron mobility transistor devices fabricated by dry etching exhibited a peak transconductance, gm, of 330 mS/mm, a breakdown voltage of 115 V, a current-gain cutoff frequency (f{sub T}) of 18 GHz, and a maximum oscillation frequency (f{sub max}) of 66 GHz. - Highlights: • The double plasma process was carried out by two different etching techniques. • Double plasma treated device exhibited a transconductance of 330 mS/mm. • Completed 0.5 μm gate device exhibited a current-gain cutoff frequency of 18 GHz. • The off-state breakdown voltage of 115 V for 0.5 μm gate device was obtained. • Continuous-wave output power density of 4.3 W/mm was obtained at 2.4 GHz.

Fabrication of enhancement-mode AlGaN/GaN high electron mobility transistors using double plasma treatment

International Nuclear Information System (INIS)

Lim, Jong-Won; Ahn, Ho-Kyun; Kim, Seong-il; Kang, Dong-Min; Lee, Jong-Min; Min, Byoung-Gue; Lee, Sang-Heung; Yoon, Hyung-Sup; Ju, Chull-Won; Kim, Haecheon; Mun, Jae-Kyoung; Nam, Eun-Soo; Park, Hyung-Moo

2013-01-01

We report the fabrication and DC and microwave characteristics of 0.5 μm AlGaN/GaN high electron mobility transistors using double plasma treatment process. Silicon nitride layers 700 and 150 Å thick were deposited by plasma-enhanced chemical vapor deposition at 260 °C to protect the device and to define the gate footprint. The double plasma process was carried out by two different etching techniques to obtain enhancement-mode AlGaN/GaN high electron mobility transistors with 0.5 μm gate lengths. The enhancement-mode AlGaN/GaN high electron mobility transistor was prepared in parallel to the depletion-mode AlGaN/GaN high electron mobility transistor device on one wafer. Completed double plasma treated 0.5 μm AlGaN/GaN high electron mobility transistor devices fabricated by dry etching exhibited a peak transconductance, gm, of 330 mS/mm, a breakdown voltage of 115 V, a current-gain cutoff frequency (f T ) of 18 GHz, and a maximum oscillation frequency (f max ) of 66 GHz. - Highlights: • The double plasma process was carried out by two different etching techniques. • Double plasma treated device exhibited a transconductance of 330 mS/mm. • Completed 0.5 μm gate device exhibited a current-gain cutoff frequency of 18 GHz. • The off-state breakdown voltage of 115 V for 0.5 μm gate device was obtained. • Continuous-wave output power density of 4.3 W/mm was obtained at 2.4 GHz

Improvement of Plating Characteristics Between Nickel and PEEK by Plasma Treatment and Chemical Etching

International Nuclear Information System (INIS)

Lee, Hye W.; Lee, Jong K.; Park, Ki Y.

2009-01-01

Surface of PEEK(poly-ether-ether-ketone) was modified by chemical etching, plasma treatment and mechanical grinding to improve the plating adhesion. The plating characteristics of these samples were studied by the contact angle, plating thickness, gloss and adhesion. Chemical etching and plasma treatment increased wettability, adhesion and gloss. The contact angle of as-received PEEK was 61 .deg. . The contact angles of chemical etched, plasma treated or both were improved to the range of 15∼33 .deg. . In the case of electroless plating, the thickest layer without blister was 1.6 μm. The adhesion strengths by chemical etching, plasma treatment or both chemical etching and plasma treatment were 75 kgf/cm 2 , 102 kgf/cm 2 , 113 kgf/cm 2 , respectively, comparing to the 24 kgf/cm 2 of as-received. In the case of mechanically ground PEEKs, the adhesion strengths were higher than those unground, with the sacrifice of surface gloss. The gloss of untreated PEEK were greater than mechanically ground PEEKs. Plating thickness increased linearly with the plating times

Enhanced Plasma Confinement in a Magnetic Well by Whistler Waves

DEFF Research Database (Denmark)

Balmashnov, A. A.; Juul Rasmussen, Jens

1981-01-01

The propagation of whistler waves in a magnetic field of mirror configuration is investigated experimentally. The strong interaction between waves and particles at the electron-cyclotron resonance leads to enhanced confinement in the magnetic well.......The propagation of whistler waves in a magnetic field of mirror configuration is investigated experimentally. The strong interaction between waves and particles at the electron-cyclotron resonance leads to enhanced confinement in the magnetic well....

Surface-modified polymeric pads for enhanced performance during chemical mechanical planarization

International Nuclear Information System (INIS)

Deshpande, S.; Dakshinamurthy, S.; Kuiry, S.C.; Vaidyanathan, R.; Obeng, Y.S.; Seal, S.

2005-01-01

The chemical mechanical planarization (CMP) process occurs at an atomic level at the slurry/wafer interface and hence slurries and polishing pads play a critical role in their successful implementation. Polyurethane is a commonly used polymer in the manufacturing of CMP pads. These pads are incompatible with some chemicals present in the CMP slurries, such as hydrogen peroxide. To overcome these problems, Psiloquest has developed new Application Specific Pads (ASP). Surface of such pads has been modified by depositing a thin film of tetraethyl orthosilicate using plasma-enhanced chemical vapor deposition (PECVD) process. In the present study, mechanical properties of such coated pads have been investigated using nanoindentation. The surface morphology and the chemistry of the ASP were studied using scanning electron microcopy, X-ray photoelectron spectroscopy, and Fourier transform infrared spectroscopy techniques. It was observed that mechanical and chemical properties of the pad top surface are a function of the PECVD coating time. Such PECVD-treated pads are found to be hydrophilic and do not require storage in aqueous media during the not-in-use period. The metal removal rate using such surface-modified polishing pads was found to increase linearly with the PECVD coating time

Response of plasma rotation to resonant magnetic perturbations in J-TEXT tokamak

Science.gov (United States)

Yan, W.; Chen, Z. Y.; Huang, D. W.; Hu, Q. M.; Shi, Y. J.; Ding, Y. H.; Cheng, Z. F.; Yang, Z. J.; Pan, X. M.; Lee, S. G.; Tong, R. H.; Wei, Y. N.; Dong, Y. B.; J-TEXT Team

2018-03-01

The response of plasma toroidal rotation to the external resonant magnetic perturbations (RMP) has been investigated in Joint Texas Experimental Tokamak (J-TEXT) ohmic heating plasmas. For the J-TEXT’s plasmas without the application of RMP, the core toroidal rotation is in the counter-current direction while the edge rotation is near zero or slightly in the co-current direction. Both static RMP experiments and rotating RMP experiments have been applied to investigate the plasma toroidal rotation. The core toroidal rotation decreases to lower level with static RMP. At the same time, the edge rotation can spin to more than 20 km s-1 in co-current direction. On the other hand, the core plasma rotation can be slowed down or be accelerated with the rotating RMP. When the rotating RMP frequency is higher than mode frequency, the plasma rotation can be accelerated to the rotating RMP frequency. The plasma confinement is improved with high frequency rotating RMP. The plasma rotation is decelerated to the rotating RMP frequency when the rotating RMP frequency is lower than the mode frequency. The plasma confinement also degrades with low frequency rotating RMP.

Evaluation of mechanism of non-thermal plasma effect on the surface of polypropylene films for enhancement of adhesive and hemo compatible properties

Energy Technology Data Exchange (ETDEWEB)

Navaneetha Pandiyaraj, K., E-mail: dr.knpr@gmail.com [Surface Engineering Laboratory, Department of Physics, Sri Shakthi Institute of Engineering and Technology, L& T by pass, Chinniyam Palayam (post), Coimbatore-641062 (India); Deshmukh, R.R. [Department of Physics, Institute of Chemical Technology, Matunga, Mumbai-400 019 (India); Arunkumar, A.; Ramkumar, M.C. [Surface Engineering Laboratory, Department of Physics, Sri Shakthi Institute of Engineering and Technology, L& T by pass, Chinniyam Palayam (post), Coimbatore-641062 (India); Ruzybayev, I.; Ismat Shah, S. [Department of Physics and Astronomy, Department of Materials Science and Engineering, University of Delaware, 208 Dupont Hall, Newark (United States); Su, Pi-Guey [Department of Chemistry, Chinese Culture University, Taipei 111, Taiwan (China); Periayah, Mercy Halleluyah; Halim, A.S. [School of Medical Sciences, Health Campus, Universiti Sains Malaysia, 16150 Kubang Kerian, Kelantan (Malaysia)

2015-08-30

Highlights: • Investigated the mechanism of effect of various gaseous plasma treatments on the surface properties of Polypropylene (PP) films. • The improvement in surface energy is basically due to the incorporation of polar functional groups onto the PP films. • The extent of surface modification and hydrophobic recovery depends upon the type of plasma forming gas. • Due to the significant morphological and chemical changes induced by the gaseous plasma treatment, improved the blood compatibility as well as adhesive strength of the PP films. - Abstract: The hydro-carbon based polymers have attracted attention of scientists for its use in bio-medical field as various implants due to inherent flexibility. However, they have poor surface properties; particularly they have low surface energy (SE). Hence, blood components (platelets, blood proteins, etc.)-polymer surface interaction is the major concern when it comes in contact with blood. Thus, surface modification is required to develop the perfect antithrombogenic property without affecting the materials bulk. The present study describes the improvement in adhesive and blood compatible properties of polypropylene (PP) by low temperature (non-thermal) plasma of various gases such as Ar, O{sub 2}, air and Ar + O{sub 2} for biomedical applications. The changes in surface morphological, chemical and hydrophilic modification induced by the gaseous plasma treatment were analyzed by atomic force microscopy (AFM), X-ray photo electron spectroscopy (XPS), electron spin resonance (ESR) spectroscopy and contact angle measurements, respectively. Moreover, the stability of plasma effect was also studied for the different storage conditions. Variation in adhesive strength of the plasma treated PP film was studied by T-Peel and Lap-Shear strength tests. The blood compatibility of the surface modified PP films was investigated by in vitro analysis. It was found that gaseous plasma treatment improved the blood compatibility

Evaluation of mechanism of non-thermal plasma effect on the surface of polypropylene films for enhancement of adhesive and hemo compatible properties

International Nuclear Information System (INIS)

Navaneetha Pandiyaraj, K.; Deshmukh, R.R.; Arunkumar, A.; Ramkumar, M.C.; Ruzybayev, I.; Ismat Shah, S.; Su, Pi-Guey; Periayah, Mercy Halleluyah; Halim, A.S.

2015-01-01

Highlights: • Investigated the mechanism of effect of various gaseous plasma treatments on the surface properties of Polypropylene (PP) films. • The improvement in surface energy is basically due to the incorporation of polar functional groups onto the PP films. • The extent of surface modification and hydrophobic recovery depends upon the type of plasma forming gas. • Due to the significant morphological and chemical changes induced by the gaseous plasma treatment, improved the blood compatibility as well as adhesive strength of the PP films. - Abstract: The hydro-carbon based polymers have attracted attention of scientists for its use in bio-medical field as various implants due to inherent flexibility. However, they have poor surface properties; particularly they have low surface energy (SE). Hence, blood components (platelets, blood proteins, etc.)-polymer surface interaction is the major concern when it comes in contact with blood. Thus, surface modification is required to develop the perfect antithrombogenic property without affecting the materials bulk. The present study describes the improvement in adhesive and blood compatible properties of polypropylene (PP) by low temperature (non-thermal) plasma of various gases such as Ar, O 2 , air and Ar + O 2 for biomedical applications. The changes in surface morphological, chemical and hydrophilic modification induced by the gaseous plasma treatment were analyzed by atomic force microscopy (AFM), X-ray photo electron spectroscopy (XPS), electron spin resonance (ESR) spectroscopy and contact angle measurements, respectively. Moreover, the stability of plasma effect was also studied for the different storage conditions. Variation in adhesive strength of the plasma treated PP film was studied by T-Peel and Lap-Shear strength tests. The blood compatibility of the surface modified PP films was investigated by in vitro analysis. It was found that gaseous plasma treatment improved the blood compatibility as well

Through tissue imaging of a live breast cancer tumour model using handheld surface enhanced spatially offset resonance Raman spectroscopy (SESORRS).

Science.gov (United States)

Nicolson, Fay; Jamieson, Lauren E; Mabbott, Samuel; Plakas, Konstantinos; Shand, Neil C; Detty, Michael R; Graham, Duncan; Faulds, Karen

2018-04-21

In order to improve patient survival and reduce the amount of unnecessary and traumatic biopsies, non-invasive detection of cancerous tumours is of imperative and urgent need. Multicellular tumour spheroids (MTS) can be used as an ex vivo cancer tumour model, to model in vivo nanoparticle (NP) uptake by the enhanced permeability and retention (EPR) effect. Surface enhanced spatially offset Raman spectroscopy (SESORS) combines both surface enhanced Raman spectroscopy (SERS) and spatially offset Raman spectroscopy (SORS) to yield enhanced Raman signals at much greater sub-surface levels. By utilizing a reporter that has an electronic transition in resonance with the laser frequency, surface enhanced resonance Raman scattering (SERRS) yields even greater enhancement in Raman signal. Using a handheld SORS spectrometer with back scattering optics, we demonstrate the detection of live breast cancer 3D MTS containing SERRS active NPs through 15 mm of porcine tissue. False color 2D heat intensity maps were used to determine tumour model location. In addition, we demonstrate the tracking of SERRS-active NPs through porcine tissue to depths of up to 25 mm. This unprecedented performance is due to the use of red-shifted chalcogenpyrylium-based Raman reporters to demonstrate the novel technique of surface enhanced spatially offset resonance Raman spectroscopy (SESORRS) for the first time. Our results demonstrate a significant step forward in the ability to detect vibrational fingerprints from a tumour model at depth through tissue. Such an approach offers significant promise for the translation of NPs into clinical applications for non-invasive disease diagnostics based on this new chemical principle of measurement.

Investigation of RF-enhanced plasma potentials on Alcator C-Mod

International Nuclear Information System (INIS)

Ochoukov, R.; Whyte, D.G.; Brunner, D.; Cziegler, I.; LaBombard, B.; Lipschultz, B.; Myra, J.; Terry, J.; Wukitch, S.

2013-01-01

Radio frequency (RF) sheath rectification is a leading mechanism suspected of causing anomalously high erosion of plasma facing materials in RF-heated plasmas on Alcator C-Mod. An extensive experimental survey of the plasma potential (Φ P ) in RF-heated discharges on C-Mod reveals that significant Φ P enhancement (>100 V) is found on outboard limiter surfaces, both mapped and not mapped to active RF antennas. Surfaces that magnetically map to active RF antennas show Φ P enhancement that is, in part, consistent with the recently proposed slow wave rectification mechanism. Surfaces that do not map to active RF antennas also experience significant Φ P enhancement, which strongly correlates with the local fast wave intensity. In this case, fast wave rectification is a leading candidate mechanism responsible for the observed enhancement

On the plasma confinement by acoustic resonance. An innovation for electrodeless high-pressure discharge lamps

Science.gov (United States)

Courret, Gilles; Nikkola, Petri; Wasterlain, Sébastien; Gudozhnik, Olexandr; Girardin, Michel; Braun, Jonathan; Gavin, Serge; Croci, Mirko; Egolf, Peter W.

2017-08-01

In an applied research project on the development of a pulsed microwave sulfur lamp prototype of 1 kW, we have discovered an amazing phenomenon in which the plasma forms a ball staying at the center of the bulb despite gravity, thus protecting the glass from melting. In this paper, it is shown that this results from an acoustic resonance in a spherical mode. Measurements of the plasma response to short pulses are presented showing beats at the spherical resonance. It is demonstrated that the beats could result from the simultaneous excitation of two normal modes with a frequency difference of approximately 1%. One of the two frequencies matches precisely the microwave pulses repetition, a little below 30 kHz. Thus this one is due to a forced oscillation, whereas the other one is due to a free oscillation. The phase velocity of sound was calculated as a function of temperature in order to find the series of temperatures at which a resonance would occur if the bulb were an isothermal solid sphere. The mean temperature inside the actual bulb was determined from the only doublet of this series, that has characteristic frequencies close enough to cause the observed beats. In addition, one of these two modes has a spherical symmetry that can explain the plasma ball formation. The obtained mean temperature is consistent with the direct measurements on the bulb surface as well as with the temperature in the core of a similar plasma found in the literature. We have also proposed a model of the resonance onset based on the acoustic dispersion and the sound amplification due to electromagnetic coupling.

Half bridge resonant converter for ignition of thermal plasmas

International Nuclear Information System (INIS)

Pena E, L.

1997-01-01

In this work the background, design, implementation and performance of a half bridge resonant converter (HBRC) used as an electronic ignition system for arc plasma torch generation is presented. The significance of the design lies in its simplicity, versatility and low cost. The system operates like a high voltage supply attached to electrodes before gaseous breakdown and like open circuit when electric arc is established. Resonant converter is implemented with a high voltage and high speed power driver intended for control the power MOSFET transistors connected in half bridge topology with L C load. The HBRC operates besides interference into domestic electric supply line (120 V, 60 Hz) as well electric measurement devices. Advantages and limitations of the converter are reviewed. Experimental impedance variation in the medium as a function of frequency operation and some experiences in striking arcs are also presented. (Author)

Ultralow k films by using a plasma-enhanced chemical vapor deposition porogen approach: Study of the precursor reaction mechanisms

International Nuclear Information System (INIS)

Castex, A.; Jousseaume, V.; Deval, J.; Bruat, J.; Favennec, L.; Passemard, G.

2008-01-01

As interconnects are scaled down, much effort is made to achieve ultralow k material with a dielectric constant lower than 2.5. Thus, many new precursors are investigated in plasma-enhanced chemical vapor deposition. This is particularly true with the porogen approach where two molecules are used: an organosilicon to create the silicon matrix and an organic molecule ''porogen'' that creates material porosity during a post-treatment such as annealing. In this article, the influence of the organosilicon molecular structure is investigated. Two ''matrix precursors'' with different structures are therefore compared. The first one, referred to as D5, has a ring structure (decamethyl pentacyclosiloxane); the second one, referred to as DEOMS, has a star structure (diethoxymethyl silane). The porogen organic molecule, referred to as CHO, is cyclohexen oxide. The fragmentation paths of the precursor molecules in the plasma are investigated by quadrupole mass spectroscopy and the film structure is studied by Fourier transform infrared spectroscopy. The mass spectroscopy analysis shows that the fragmentation in plasma is highest for DEOMS, intermediate for CHO, and lowest for D5 in comparable process conditions. At the maximum plasma power setting, the loss rate, which yields molecule consumption, is 43%-81% for the D5-CHO mixture, respectively, and 73%-37% for the DEOMS-CHO mixture, respectively. This is related to higher bond-dissociation energy for the siloxane (Si-O-Si) link in D5 than silane (Si-H), silylethoxyde (Si-OC 2 H 5 ) in DEOMS, or C-C and epoxy cycle in CHO. Indeed, a higher electron-energy relative threshold for dissociation under electron impact is measured for D5 (around 7 eV) than for DEOMS and CHO (around 4 eV). Moreover, the fragment structures differ from one precursor to another. Methyl groups are abstracted from D5 and a few polysiloxane chains are produced from pentacycle opening and fragmentation. In the case of DEOMS, many single silicon

Adsorbability Enhancement of Macroporous Resin by Dielectric Barrier Discharge Plasma Treatment to Phenol in Water

Directory of Open Access Journals (Sweden)

Shoufeng Tang

2016-01-01

Full Text Available In order to enhance the adsorption efficiency and economize the use of macroporous resin, we have treated it with the dielectric barrier discharge (DBD plasma to improve its adsorbing capacity for phenol. The effects of operation conditions, for instance, applied voltage, treated time, and air flow rate on resin, were investigated by adsorption kinetics and isotherms. Results showed that the adsorption data were in good agreement with the pseudo-second-order and Freundlich equation. Experimental results showed that the modified resin was 156.5 mg/g and 39.2% higher than the untreated sample, when the modified conditions were conducted for discharge voltage 20 kV, treatment time 45 min, and air flow rate 1.2 L/min. The resin was characterized by FTIR and nitrogen adsorption isotherms before and after the DBD processes. It was found that the reason for the enhancement of resin adsorbability was attributed to the DBD plasma changing the surface physical and chemical structure.

Cavity-enhanced resonant tunneling photodetector at telecommunication wavelengths

International Nuclear Information System (INIS)

Pfenning, Andreas; Hartmann, Fabian; Langer, Fabian; Höfling, Sven; Kamp, Martin; Worschech, Lukas

2014-01-01

An AlGaAs/GaAs double barrier resonant tunneling diode (RTD) with a nearby lattice-matched GaInNAs absorption layer was integrated into an optical cavity consisting of five and seven GaAs/AlAs layers to demonstrate cavity enhanced photodetection at the telecommunication wavelength 1.3 μm. The samples were grown by molecular beam epitaxy and RTD-mesas with ring-shaped contacts were fabricated. Electrical and optical properties were investigated at room temperature. The detector shows maximum photocurrent for the optical resonance at a wavelength of 1.29 μm. At resonance a high sensitivity of 3.1×10 4 A/W and a response up to several pA per photon at room temperature were found

Toroidal modeling of plasma response and resonant magnetic perturbation field penetration

Czech Academy of Sciences Publication Activity Database

Liu, Y.Q.; Kirk, A.; Sun, Y.; Cahyna, Pavel; Chapman, I.T.; Denner, P.; Fishpool, G.; Garofalo, A.M.; Harrison, J.R.; Nardon, E.

2012-01-01

Roč. 54, č. 12 (2012), s. 124013-124013 ISSN 0741-3335 Institutional research plan: CEZ:AV0Z20430508 Keywords : tokamak * resonant magnetic perturbation * neoclassical toroidal viscosity Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 2.369, year: 2012 http://iopscience.iop.org/0741-3335/54/12/124013/pdf/0741-3335_54_12_124013.pdf

Plasma-enhanced growth, composition, and refractive index of silicon oxy-nitride films

DEFF Research Database (Denmark)

Mattsson, Kent Erik

1995-01-01

Secondary ion mass spectrometry and refractive index measurements have been carried out on silicon oxy-nitride produced by plasma-enhanced chemical vapor deposition (PECVD). Nitrous oxide and ammonia were added to a constant flow of 2% silane in nitrogen, to produce oxy-nitride films with atomic...... nitrogen concentrations between 2 and 10 at. %. A simple atomic valence model is found to describe both the measured atomic concentrations and published material compositions for silicon oxy-nitride produced by PECVD. A relation between the Si–N bond concentration and the refractive index is found......-product. A model, that combine the chemical net reaction and the stoichiometric rules, is found to agree with measured deposition rates for given material compositions. Effects of annealing in a nitrogen atmosphere has been investigated for the 400 °C– 1100 °C temperature range. It is observed that PECVD oxy...

Gravimetrical and chemical characterization of SiOx structures deposited on fine powders by short plasma exposure in a plasma down stream reactor

International Nuclear Information System (INIS)

Spillmann, Adrian; Sonnenfeld, Axel; Rohr, Philipp Rudolf von

2008-01-01

The surface of lactose particles was modified by a plasma-enhanced chemical vapor deposition process to improve the flow behavior of the powder. For this, the particulates were treated in a plasma down stream reactor which provides a short (50 ms) and homogeneous exposure to the capacitively coupled RF discharge. The organosilicon monomer hexamethyldisiloxane (HMDSO) was used as a precursor for the formation of SiO x which is deposited on the substrate particle surface. For varying process gas mixtures (O 2 /Ar/HMDSO) and RF power applied, the amount of the deposited material was determined gravimetrically after dissolution of the lactose substrate particles and the chemical composition of the accumulated deposition material was investigated by means of attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy. The concentration of the deposited SiO x relating to the substrate material was found to be in the range of 0.1 wt.%. Based on the ATR-FTIR analysis, the inorganic, i.e. oxidic SiO x fraction of the obtained deposits was shown to be controllable by varying the process parameters, whilst a relatively large amount of organic structures must be considered.

Resonance parallel viscosity in the banana regime in poloidally rotating tokamak plasmas

International Nuclear Information System (INIS)

Shaing, K.C.; Hsu, C.T.; Dominguez, N.

1994-01-01

Parallel viscosity in the banana regime in a poloidally (ExB) rotating tokamak plasma is calculated to include the effects of orbit squeezing and to allow the poloidal ExB Mach number M p to have a value of order unity. Here, E is the electric field and B is the magnetic field. The effects of orbit squeezing not only modify the size of the particle orbit, but also change the fraction of poloidally trapped particles. Resonance between the particle parallel (to B) speed u and the poloidal component of the ExB velocity can only occur for those particles with energy (v/v t ) 2 >M 2 p (with v the particle speed and v t the thermal speed). Thus, the resonance parallel plasma viscosity in the banana regime decreases exponentially with M 2 p when M 2 p ≥1, and has a local maximum of M 2 p ∼1

Wavelength modulated surface enhanced (resonance) Raman scattering for background-free detection.

Science.gov (United States)

Praveen, Bavishna B; Steuwe, Christian; Mazilu, Michael; Dholakia, Kishan; Mahajan, Sumeet

2013-05-21

Spectra in surface-enhanced Raman scattering (SERS) are always accompanied by a continuum emission called the 'background' which complicates analysis and is especially problematic for quantification and automation. Here, we implement a wavelength modulation technique to eliminate the background in SERS and its resonant version, surface-enhanced resonance Raman scattering (SERRS). This is demonstrated on various nanostructured substrates used for SER(R)S. An enhancement in the signal to noise ratio for the Raman bands of the probe molecules is also observed. This technique helps to improve the analytical ability of SERS by alleviating the problem due to the accompanying background and thus making observations substrate independent.

Properties of the ion-ion hybrid resonator in fusion plasmas

International Nuclear Information System (INIS)

Morales, George J.

2015-01-01

The project developed theoretical and numerical descriptions of the properties of ion-ion hybrid Alfvn resonators that are expected to arise in the operation of a fusion reactor. The methodology and theoretical concepts were successfully compared to observations made in basic experiments in the LAPD device at UCLA. An assessment was made of the excitation of resonator modes by energetic alpha particles for burning plasma conditions expected in the ITER device. The broader impacts included the generation of basic insight useful to magnetic fusion and space science researchers, defining new avenues for exploration in basic laboratory experiments, establishing broader contacts between experimentalists and theoreticians, completion of a Ph.D. dissertation, and promotion of interest in science through community outreach events and classroom instruction.

Laser-plasma interaction at 10.6 microns

International Nuclear Information System (INIS)

Jones, R.D.; Kindel, J.M.

1983-01-01

The absorption mechanisms at 10.6μm are considered. Given our best theoretical knowledge, at high intensity, CO 2 absorption is a combination of resonant absorption, critical surface decay processes (rippling), and forward and backward Raman scattering. At low intensities (less than 10 14 W/cm 2 ), in short pulse CO 2 experiments, resonant absorption is believed to dominate. The properties of the self generated magnetic fields are considered. These fields greatly affect the hot electron preheat, the lateral transport of energy along the surface of the target, and the enhanced plasma blowoff. And finally, the properties of the enhanced plasma blowoff will be discussed. In directly driven targets, this blowoff represents an energy loss. It has been suggested, however, that the blowoff itself can be used to drive targets

Magnetic resonance imaging determined visceral fat reduction associates with enhanced IL-10 plasma levels in calorie restricted obese subjects.

Directory of Open Access Journals (Sweden)

Gloria Formoso

Full Text Available BACKGROUND: Obesity is characterized by a low grade chronic inflammation state. Indeed circulating pro-inflammatory cytokines, such as TNF-α and IL-6, are elevated in obese subjects, while anti-inflammatory cytokines, such as IL-10, appear to be reduced. Cytokines profile improves after weight loss, but how visceral or subcutaneous fat loss respectively affect pro- or anti-inflammatory cytokines plasma levels has not been precisely assessed. Therefore in the present study we correlated changes in circulating cytokine profile with quantitative changes in visceral and subcutaneous adipose tissue depots measured by an ad hoc Magnetic Resonance Imaging (MRI protocol before and after weight loss. MATERIALS AND METHODS: In 14 obese subjects, MRI determination of visceral and subcutaneous fat and plasma glucose, insulin, TNF-α IL-6, and IL-10 measurements were performed before and after a caloric restriction induced weight loss of at least 5% of the original body weight. RESULTS: Weight loss improved insulin sensitivity (QUICKI Index: 0.35±0.03 vs 0.37±0.04; P<0.05, increased IL-10 (3.4±1.9 vs 4.6±1.0 pg/mL; P<0.03, and reduced TNF-α and IL-6 plasma levels (2.5±1.3 vs 1.6±1.5 pg/mL, P<0.0015, 2.3±0.4 vs 1.6±0.6 pg/mL, P<0.02 respectively. A significant correlation was observed between the amount of visceral fat loss and the percentage reduction in both TNF-α (r = 0.56, p<0.05 and IL-6 (r = 0.19 p<0.05 plasma levels. In a multiple regression analysis, the amount of visceral fat loss independently correlated with the increase in IL-10 plasma levels. CONCLUSION: The reduction in visceral adipose tissue is the main driver of the improved inflammatory profile induced by weight loss.

Confluence or independence of microwave plasma bullets in atmospheric argon plasma jet plumes

Science.gov (United States)

Li, Ping; Chen, Zhaoquan; Mu, Haibao; Xu, Guimin; Yao, Congwei; Sun, Anbang; Zhou, Yuming; Zhang, Guanjun

2018-03-01

Plasma bullet is the formation and propagation of a guided ionization wave (streamer), normally generated in atmospheric pressure plasma jet (APPJ). In most cases, only an ionization front produces in a dielectric tube. The present study shows that two or three ionization fronts can be generated in a single quartz tube by using a microwave coaxial resonator. The argon APPJ plumes with a maximum length of 170 mm can be driven by continuous microwaves or microwave pulses. When the input power is higher than 90 W, two or three ionization fronts propagate independently at first; thereafter, they confluence to form a central plasma jet plume. On the other hand, the plasma bullets move independently as the lower input power is applied. For pulsed microwave discharges, the discharge images captured by a fast camera show the ionization process in detail. Another interesting finding is that the strongest lightening plasma jet plumes always appear at the shrinking phase. Both the discharge images and electromagnetic simulations suggest that the confluence or independent propagation of plasma bullets is resonantly excited by the local enhanced electric fields, in terms of wave modes of traveling surface plasmon polaritons.

Investigation of RF-enhanced plasma potentials on Alcator C-Mod

Energy Technology Data Exchange (ETDEWEB)

Ochoukov, R., E-mail: ochoukov@psfc.mit.edu [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States); Whyte, D.G.; Brunner, D. [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States); Cziegler, I. [Center for Energy Research, UCSD, 9500 Gilman Drive, La Jolla, CA 92093 (United States); LaBombard, B.; Lipschultz, B. [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States); Myra, J. [Lodestar Research Corporation, 2400 Central Avenue P-5, Boulder, CO 80301 (United States); Terry, J.; Wukitch, S. [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States)

2013-07-15

Radio frequency (RF) sheath rectification is a leading mechanism suspected of causing anomalously high erosion of plasma facing materials in RF-heated plasmas on Alcator C-Mod. An extensive experimental survey of the plasma potential (Φ{sub P}) in RF-heated discharges on C-Mod reveals that significant Φ{sub P} enhancement (>100 V) is found on outboard limiter surfaces, both mapped and not mapped to active RF antennas. Surfaces that magnetically map to active RF antennas show Φ{sub P} enhancement that is, in part, consistent with the recently proposed slow wave rectification mechanism. Surfaces that do not map to active RF antennas also experience significant Φ{sub P} enhancement, which strongly correlates with the local fast wave intensity. In this case, fast wave rectification is a leading candidate mechanism responsible for the observed enhancement.

Theoretical studies of surface enhanced hyper-Raman spectroscopy: The chemical enhancement mechanism

Science.gov (United States)

Valley, Nicholas; Jensen, Lasse; Autschbach, Jochen; Schatz, George C.

2010-08-01

Hyper-Raman spectra for pyridine and pyridine on the surface of a tetrahedral 20 silver atom cluster are calculated using static hyperpolarizability derivatives obtained from time dependent density functional theory. The stability of the results with respect to choice of exchange-correlation functional and basis set is verified by comparison with experiment and with Raman spectra calculated for the same systems using the same methods. Calculated Raman spectra were found to match well with experiment and previous theoretical calculations. The calculated normal and surface enhanced hyper-Raman spectra closely match experimental results. The chemical enhancement factors for hyper-Raman are generally larger than for Raman (102-104 versus 101-102). Integrated hyper-Raman chemical enhancement factors are presented for a set of substituted pyridines. A two-state model is developed to predict these chemical enhancement factors and this was found to work well for the majority of the molecules considered, providing a rationalization for the difference between hyper-Raman and Raman enhancement factors.

Enhancement of electron field emission of vertically aligned carbon nanotubes by nitrogen plasma treatment

Energy Technology Data Exchange (ETDEWEB)

Wang, B.B. [College of Chemistry and Chemical Engineering, Chongqing University of Technology, 69 Hongguang Rd, Lijiatuo, Banan District, Chongqing 400054 (China); Plasma Nanoscience Centre Australia (PNCA), CSIRO Materials Science and Engineering, P.O. Box 218, Lindfield, NSW 2070 (Australia); Cheng, Q.J. [Plasma Nanoscience Centre Australia (PNCA), CSIRO Materials Science and Engineering, P.O. Box 218, Lindfield, NSW 2070 (Australia); Plasma Nanoscience, School of Physics, University of Sydney, Sydney, NSW 2006 (Australia); Chen, X. [College of Materials Science and Engineering, Chongqing University, Chongqing 400044 (China); Ostrikov, K., E-mail: kostya.ostrikov@csiro.au [Plasma Nanoscience Centre Australia (PNCA), CSIRO Materials Science and Engineering, P.O. Box 218, Lindfield, NSW 2070 (Australia); Plasma Nanoscience, School of Physics, University of Sydney, Sydney, NSW 2006 (Australia)

2011-09-22

Highlights: > A new and custom-designed bias-enhanced hot-filament chemical vapor deposition system is developed to synthesize vertically aligned carbon nanotubes. > The carbon nanotubes are later treated with nitrogen plasmas. > The electron field emission characteristics of the carbon nanotubes are significantly improved after the nitrogen plasma treatment. > A new physical mechanism is proposed to interpret the improvement of the field emission characteristics. - Abstract: The electron field emission (EFE) characteristics from vertically aligned carbon nanotubes (VACNTs) without and with treatment by the nitrogen plasma are investigated. The VACNTs with the plasma treatment showed a significant improvement in the EFE property compared to the untreated VACNTs. The morphological, structural, and compositional properties of the VACNTs are extensively examined by scanning electron microscopy, transmission electron microscopy, Raman spectroscopy, and energy dispersive X-ray spectroscopy. It is shown that the significant EFE improvement of the VACNTs after the nitrogen plasma treatment is closely related to the variation of the morphological and structural properties of the VACNTs. The high current density (299.6 {mu}A/cm{sup 2}) achieved at a low applied field (3.50 V/{mu}m) suggests that the VACNTs after nitrogen plasma treatment can serve as effective electron field emission sources for numerous applications.

Enhancement of electron field emission of vertically aligned carbon nanotubes by nitrogen plasma treatment

International Nuclear Information System (INIS)

Wang, B.B.; Cheng, Q.J.; Chen, X.; Ostrikov, K.

2011-01-01

Highlights: → A new and custom-designed bias-enhanced hot-filament chemical vapor deposition system is developed to synthesize vertically aligned carbon nanotubes. → The carbon nanotubes are later treated with nitrogen plasmas. → The electron field emission characteristics of the carbon nanotubes are significantly improved after the nitrogen plasma treatment. → A new physical mechanism is proposed to interpret the improvement of the field emission characteristics. - Abstract: The electron field emission (EFE) characteristics from vertically aligned carbon nanotubes (VACNTs) without and with treatment by the nitrogen plasma are investigated. The VACNTs with the plasma treatment showed a significant improvement in the EFE property compared to the untreated VACNTs. The morphological, structural, and compositional properties of the VACNTs are extensively examined by scanning electron microscopy, transmission electron microscopy, Raman spectroscopy, and energy dispersive X-ray spectroscopy. It is shown that the significant EFE improvement of the VACNTs after the nitrogen plasma treatment is closely related to the variation of the morphological and structural properties of the VACNTs. The high current density (299.6 μA/cm 2 ) achieved at a low applied field (3.50 V/μm) suggests that the VACNTs after nitrogen plasma treatment can serve as effective electron field emission sources for numerous applications.

On the chemical enhancement in SERS

Science.gov (United States)

Jensen, Lasse

2012-12-01

In Surface-enhanced Raman scattering (SERS), the Raman signal of a molecule adsorbed on a metal surface is enhanced by many orders of magnitude. This provides a "finger-print" of molecules which can be used in ultrasensitive sensing devises. Here we present a time-dependent density functional theory (TDDFT) study of the molecule-surface chemical coupling in SERS. A systematic study of the chemical enhancement (CHEM) of meta-and para-substituted pyridines interacting with a small silver cluster (Ag20) is presented. We find that the magnitude of chemical enhancement is governed to a large extent by the energy difference between the highest occupied energy level (HOMO) of the metal and the lowest unoccupied energy level (LUMO) of the molecule. A two-state approximation shows that the enhancement scales roughly as (ωX/ω¯e)4, where accent="true">ω¯e is an average excitation energy between the HOMO of the metal and the LUMO of the molecule and wX the HOMO-LUMO gap of the free molecule. Furthermore, we demonstrate that it is possible to control the CHEM enhancement by switching a dithienylethene photoswitch from its closed form to its open form. The open form of the photoswitch is found to be the strongest Raman scatterer when adsorbed on the surface whereas the opposite is found for the free molecule. This trend is explained using the simple two-state approximation.

The Synergistic Effect between Electrical and Chemical Factors in Plasma Gene/Molecule-Transfection

Science.gov (United States)

Jinno, Masafumi

2016-09-01

This study has been done to know what kind of factors in plasma and processes on cells promote plasma gene/molecule transfection. We have discovered a new plasma source using a microcapillary electrode which enables high transfection efficiency and high cell survivability simultaneously. However, the mechanism of the transfection by plasma was not clear. To clarify the transfection mechanisms by micro plasma, we focused on the effects of electrical (current, charge, field, etc.) and chemical (radicals, RONS, etc.) factors generated by the micro plasma and evaluated the contribution weight of three groups of the effects and processes, i.e. electrical, chemical and biochemical ones. At first, the necessity of the electrical factors was estimated by the laser produced plasma (LPP). Mouse L-929 fibroblast cell was cultured on a 96-well plate or 12-well micro slide chamber. Plasmids pCX-EGFP in Tris-EDTA buffer was dropped on the cells and they were exposed to the capillary discharge plasma (CDP) or the LPP. In the case of the CDP, the plasma was generated between the tip of the capillary electrode and the cells so that both electrical and chemical factors were supplied to the cells. In this setup, about 20% of average transfection efficiency was obtained. In the case of the LPP, the plasma was generated apart from the cells so that electrical factors were not supplied to the cells. In this setup, no transfection was observed. These results show that the electrical factors are necessary for the plasma gene transfection. Next, the necessity of the chemical factors was estimated the effect of catalase to remove H2O2 in CDP. The transfection efficiency decreased to 0.4 by scavenging H2O2 with catalase. However, only the solution of H2O2 caused no gene transfection in cells. These results shows that H2O2 is important species to cause gene/molecule transfection but still needs a synergistic effect with electrical or other chemical factors. This work was partly supported by

PumpKin: A tool to find principal pathways in plasma chemical models

Science.gov (United States)

Markosyan, A. H.; Luque, A.; Gordillo-Vázquez, F. J.; Ebert, U.

2014-10-01

PumpKin is a software package to find all principal pathways, i.e. the dominant reaction sequences, in chemical reaction systems. Although many tools are available to integrate numerically arbitrarily complex chemical reaction systems, few tools exist in order to analyze the results and interpret them in relatively simple terms. In particular, due to the large disparity in the lifetimes of the interacting components, it is often useful to group reactions into pathways that recycle the fastest species. This allows a researcher to focus on the slow chemical dynamics, eliminating the shortest timescales. Based on the algorithm described by Lehmann (2004), PumpKin automates the process of finding such pathways, allowing the user to analyze complex kinetics and to understand the consumption and production of a certain species of interest. We designed PumpKin with an emphasis on plasma chemical systems but it can also be applied to atmospheric modeling and to industrial applications such as plasma medicine and plasma-assisted combustion.

Improving plasma resistance and lowering roughness in an ArF photoresist by adding a chemical reaction inhibitor

International Nuclear Information System (INIS)

Jinnai, Butsurin; Uesugi, Takuji; Koyama, Koji; Samukawa, Seiji; Kato, Keisuke; Yasuda, Atsushi; Maeda, Shinichi; Momose, Hikaru

2010-01-01

Major challenges associated with 193 nm lithography using an ArF photoresist are low plasma resistance and roughness formation in the ArF photoresist during plasma processes. We have previously found decisive factors affecting the plasma resistance and roughness formation in an ArF photoresist: plasma resistance is determined by UV/VUV radiation, and roughness formation is dominated by chemical reactions. In this study, based on our findings on the interaction between plasma radiation species and ArF photoresist polymers, we proposed an ArF photoresist with a chemical reaction inhibitor, which can trap reactive species from the plasma, and characterized the performances of the resultant ArF photoresist through neutral beam experiments. Hindered amine light stabilizers, i.e. 4-hydroxy-2,2,6,6-tetramethyl-1-piperidinyloxy (HO-TEMPO), were used as the chemical reaction inhibitor. Etching rates of the ArF photoresist films were not dependent on the HO-TEMPO content in the irradiations without chemical reactions or under UV/VUV radiation. However, in the irradiation with chemical reactions, the etching rates of the ArF photoresist films decreased as the HO-TEMPO content increased. In addition, the surface roughness decreased with the increase in the additive amount of chemical reaction inhibitor. According to FTIR analysis, a chemical reaction inhibitor can inhibit the chemical reactions in ArF photoresist films through plasma radicals. These results indicate that a chemical reaction inhibitor is effective against chemical reactions, resulting in improved plasma resistance and less roughness in an ArF photoresist. These results also support our suggested mechanism of plasma resistance and roughness formation in an ArF photoresist.

Control of spontaneous emission rate in luminescent resonant diamond particles

Science.gov (United States)

Savelev, R.; Zalogina, A.; Kudryashov, S.; Ivanova, A.; Levchenko, A.; Makarov, S.; Zuev, D.; Shadrivov, I.

2018-01-01

We study the properties of luminescent diamond particles of different sizes (up to ~1.5 μm) containing multiple NV-centers. We theoretically predict that the average liftetime in such particles is decreased by several times as compared to optically small subwavelength nanodiamonds. In our experiments, samples were obtained by milling the plasma-enhanced chemical vapor deposited diamond film, and characterized by Raman spectroscopy and dark- field spectroscopy methods. Time-resolved luminescence measurements of the excited state of NV-centers showed that their average lifetime varies from 10 to 17 ns in different samples. By comparing this data to the values of the lifetime of the NV-centers in optically small nanodiamonds, known from literature, we confirm a severalfold decrease of the lifetime in resonant particles.

Influence of micro- and macro-processes on the high-order harmonic generation in laser-produced plasma

Energy Technology Data Exchange (ETDEWEB)

Ganeev, R. A., E-mail: rashid-ganeev@mail.ru [Ophthalmology and Advanced Laser Medical Center, Saitama Medical University, 38 Morohongo, Moroyama-machi, Iruma-gun, Saitama 350-0495 (Japan); Physical Department, Voronezh State University, Voronezh 394006 (Russian Federation)

2016-03-21

We compare the resonance-induced enhancement of single harmonic and the quasi-phase-matching-induced enhancement of the group of harmonics during propagation of the tunable mid-infrared femtosecond pulses through the perforated laser-produced indium plasma. We show that the enhancement of harmonics using the macro-process of quasi-phase-matching is comparable with the one using micro-process of resonantly enhanced harmonic. These studies show that joint implementation of the two methods of the increase of harmonic yield could be a useful tool for generation of strong short-wavelength radiation in different spectral regions. We compare these effects in indium, as well as in other plasmas.

Plasma-assisted nitrogen doping of VACNTs for efficiently enhancing the supercapacitor performance

Energy Technology Data Exchange (ETDEWEB)

Mashayekhi, Alireza; Hosseini, Seyed Mahmoud [University of Tehran, Nano-fabricated Energy Devices Laboratory, School of Electrical and Computer Engineering, College of Engineering (Iran, Islamic Republic of); Hassanpour Amiri, Morteza; Namdar, Naser [University of Tehran, Thin Film and Nano-electronics Laboratory, Nano-electronics Centre of Excellence, School of Electrical and Computer Engineering, College of Engineering (Iran, Islamic Republic of); Sanaee, Zeinab, E-mail: z.sanaee@ut.ac.ir [University of Tehran, Nano-fabricated Energy Devices Laboratory, School of Electrical and Computer Engineering, College of Engineering (Iran, Islamic Republic of)

2016-06-15

Nitrogen doping of vertically aligned carbon nanotubes (VACNTs) using plasma-enhanced chemical vapour deposition has been investigated to improve the supercapacitance performance of CNTs. Incorporating electrochemical measurements on the open-ended nitrogen-doped CNTs, showed the achievement of 6 times improvement in the capacitance value. For nitrogen-doped CNTs on silicon substrate, specific capacitance of 60 F g{sup −1} was obtained in 0.5 M KCl solution, with capacity retention ratio above 90 % after cycled at 0.1 A g{sup −1} for 5000 cycles. Using this sample, a symmetric supercapacitance was fabricated which showed the power density of 37.5 kW kg{sup −1}. The facile fabrication approach and its excellent capacitance improvement, propose it as an efficient technique for enhancing the supercapacitance performance of the carbon-based electrodes.

New fabrication technique using side-wall-type plasma-enhanced chemical-vapor deposition for a floating gate memory with a Si nanodot

Energy Technology Data Exchange (ETDEWEB)

Ichikawa, Kazunori; Punchaipetch, Prakaipetch; Yano, Hiroshi; Hatayama, Tomoaki; Uraoka, Yukiharu; Fuyuki, Takashi [Nara Institute of Science and Techonology, Ikoma, Nara (Japan); Tomyo, Atsushi; Takahashi, Eiji; Hayashi, Tsukasa; Ogata, Kiyoshi [Nissin Electric Co., Ltd., Kyoto (Japan)

2006-08-15

We have used side-wall-type plasma-enhanced chemical-vapor deposition (PECVD)to fabricate a floating gate memory using a Si nano-crystal dot on thermal SiO{sub 2} at a low temperature of 430 .deg. C. Atomic and radical hydrogen plays an important role in the low-temperature formation of the dot. Transmission electron microscopy (TEM) and atomic force microscopy (AFM) analyses revealed that the average dot size and density were approximately 5 nm and 8.5 X 10{sup 11} cm{sup -2}, respectively. The electronic properties were investigated with metal-oxide-semiconductor-field-effect transistors (MOSFETs) by embedding the nanocrystal dots into SiO{sub 2} fabricated using CVD. Electron charging and discharging were clearly confirmed at room temperature by the transient behavior of the capacitance and the transfer curve. The number of electrons confined in a single dot was approximately one. Furthermore, we evaluated the electronic behavior by varying the bias condition or the operating temperature. The critical charge density could be confirmed to be independent of the injection condition.

Chemical analysis of refractories by plasma spectrometry

International Nuclear Information System (INIS)

Coutinho, C.A.

1990-01-01

X-ray spectrometry has been, since the last two or three decades, the traditional procedure for the chemical analysis of refractories, due to its high degree of accuracy and speed to produce analytical results. An interesting alternative to X-ray fluorescence is provided by the Inductively Coupled Plasma Spectrometry technique, for those laboratories where wet chemistry facilities are already available or process control is not required at high speed, or investiment costs have to be low. This paper presents results obtained by plasma spectroscopy for the analysis of silico - aluminous refractories, showing calibration curves, precion and detection limits. Considerations and comparisons with X-ray fluorescence are also made. (author) [pt

Interaction of heavy ion beams with a hydrogen plasma: plasma lens effect and stopping power enhancement

International Nuclear Information System (INIS)

Gardes, D.; Bimbot, R.; Della-Negra, S.; Dumail, M.; Kubica, B.; Richard, A.; Rivet, M.F.; Servajean, A.; Deutsch, C.; Maynard, G.

1988-01-01

By coupling a hydrogen plasma to a Tandem accelerator, transmission and energy losses of 2 MeV/u carbon and sulfur beams passing through a plasma target have been investigated. Fluctuations in beam transmission have been observed and attributed to a plasma lens effect. Moreover, energy loss measurements indicate an enhanced stopping power of the plasma relative to its cold matter equivalent

Gadolinium-DTPA-enhanced magnetic resonance imaging of musculoskeletal infectious processes

International Nuclear Information System (INIS)

Hopkins, K.L.; Li, K.C.P.; Bergman, G.

1995-01-01

The purpose of this study was to assess whether gadolinium-enhanced magnetic resonance imaging (MRI) provides diagnostic information beyond that given by nonenhanced imaging in the evaluation of musculoskeletal infectious processes and whether it can be used for differentiating infectious from noninfectious inflammatory lesions. Magnetic resonance images performed with and without intravenous gadolinium-DTPA in 34 cases in which musculoskeletal infection had been clinically suspected were reviewed. Infectious lesions-including osteomyelitis, pyarthrosis, abscess, and cellulitis-were confirmed in a total of 22 cases: in 15 by biopsy or drainage and in 7 by clinical course. Our results show that gadolinium-DTPA-enhanced MRI is a highly sensitive technique in diagnosing musculoskeletal infectious lesions. It is especially useful in distinguishing abscesses from surrounding cellulitis/myositis. Lack of contrast enhancement rules out infection with a high degree of certainty. However, contrast enhancement cannot be used to reliably distinguish infectious from noninfectious inflammatory conditions. (orig.)

Gadolinium-DTPA-enhanced magnetic resonance imaging of musculoskeletal infectious processes

Energy Technology Data Exchange (ETDEWEB)

Hopkins, K.L. [Dept. of Diagnostic Radiology, Stanford Univ. Medical Center, CA (United States); Li, K.C.P. [Dept. of Diagnostic Radiology, Stanford Univ. Medical Center, CA (United States); Bergman, G. [Dept. of Diagnostic Radiology, Stanford Univ. Medical Center, CA (United States)

1995-07-01

The purpose of this study was to assess whether gadolinium-enhanced magnetic resonance imaging (MRI) provides diagnostic information beyond that given by nonenhanced imaging in the evaluation of musculoskeletal infectious processes and whether it can be used for differentiating infectious from noninfectious inflammatory lesions. Magnetic resonance images performed with and without intravenous gadolinium-DTPA in 34 cases in which musculoskeletal infection had been clinically suspected were reviewed. Infectious lesions-including osteomyelitis, pyarthrosis, abscess, and cellulitis-were confirmed in a total of 22 cases: in 15 by biopsy or drainage and in 7 by clinical course. Our results show that gadolinium-DTPA-enhanced MRI is a highly sensitive technique in diagnosing musculoskeletal infectious lesions. It is especially useful in distinguishing abscesses from surrounding cellulitis/myositis. Lack of contrast enhancement rules out infection with a high degree of certainty. However, contrast enhancement cannot be used to reliably distinguish infectious from noninfectious inflammatory conditions. (orig.)

Absorption enhancement in graphene with an efficient resonator

DEFF Research Database (Denmark)

Xiao, Binggang; Gu, Mingyue; Qin, Kang

2017-01-01

Graphene can be utilized in designing tunable terahertz (THz) devices due to its tunability of sheet conductivity, suffering however with weak light-graphene interactions. In this paper, an absorption enhancement in graphene using a Fabry–Perot resonator is presented, and its performance has been...

Studies on omnidirectional enhancement of giga-hertz radiation by sub-wavelength plasma modulation

Science.gov (United States)

Fanrong, KONG; Qiuyue, NIE; Shu, LIN; Zhibin, WANG; Bowen, LI; Shulei, ZHENG; Binhao, JIANG

2018-01-01

The technology of radio frequency (RF) radiation intensification for radio compact antennas based on modulation and enhancement effects of sub-wavelength plasma structures represents an innovative developing strategy. It exhibits important scientific significance and promising potential of broad applications in various areas of national strategic demands, such as electrical information network and microwave communication, detection and control technology. In this paper, laboratory experiments and corresponding analyses have been carried out to investigate the modulation and enhancement technology of sub-wavelength plasma structure on the RF electromagnetic radiation. An application focused sub-wavelength plasma-added intensification up to ∼7 dB higher than the free-space radiation is observed experimentally in giga-hertz (GHz) RF band. The effective radiation enhancement bandwidth covers from 0.85 to 1.17 GHz, while the enhanced electromagnetic signals transmitted by sub-wavelength plasma structures maintain good communication quality. Particularly, differing from the traditional RF electromagnetic radiation enhancement method characterized by focusing the radiation field of antenna in a specific direction, the sub-wavelength plasma-added intensification of the antenna radiation presents an omnidirectional enhancement, which is reported experimentally for the first time. Corresponding performance characteristics and enhancement mechanism analyses are also conducted in this paper. The results have demonstrated the feasibility and promising potential of sub-wavelength plasma modulation in application focused RF communication, and provided the scientific basis for further research and development of sub-wavelength plasma enhanced compact antennas with wide-range requests and good quality for communication.

Biocompatible KMnF3 nanoparticular contrast agent with proper plasma retention time for in vivo magnetic resonance imaging.

Science.gov (United States)

Liu, Zhi-jun; Song, Xiao-xia; Xu, Xian-zhu; Tang, Qun

2014-04-18

Nanoparticular MRI contrast agents are rapidly becoming suitable for use in clinical diagnosis. An ideal nanoparticular contrast agent should be endowed with high relaxivity, biocompatibility, proper plasma retention time, and tissue-specific or tumor-targeting imaging. Herein we introduce PEGylated KMnF3 nanoparticles as a new type of T1 contrast agent. Studies showed that the nanoparticular contrast agent revealed high bio-stability with bovine serum albumin in PBS buffer solution, and presented excellent biocompatibility (low cytotoxicity, undetectable hemolysis and hemagglutination). Meanwhile the new contrast agent possessed proper plasma retention time (circulation half-life t1/2 is approximately 2 h) in the body of the administrated mice. It can be delivered into brain vessels and maintained there for hours, and is mostly cleared from the body within 48 h, as demonstrated by time-resolved MRI and Mn-biodistribution analysis. Those distinguishing features make it suitable to obtain contrast-enhanced brain magnetic resonance angiography. Moreover, through the process of passive targeting delivery, the T1 contrast agent clearly illuminates a brain tumor (glioma) with high contrast image and defined shape. This study demonstrates that PEGylated KMnF3 nanoparticles represent a promising biocompatible vascular contrast agent for magnetic resonance angiography and can potentially be further developed into an active targeted tumor MRI contrast agent.

Delayed enhancement of peripheral zone of neurofibromas at magnetic resonance imaging

Energy Technology Data Exchange (ETDEWEB)

Kurosaki, Y. [Dept. of Radiology, Inst. of Clinical Medicine, Univ. of Tsukuba (Japan); Kuramoto, K. [Dept. of Radiology, Inst. of Clinical Medicine, Univ. of Tsukuba (Japan); Itai, Y. [Dept. of Radiology, Inst. of Clinical Medicine, Univ. of Tsukuba (Japan)

1996-02-01

It is well known that bizonal histologic appearance characteristic of neurofibromas are reflected on magnetic resonance (MR) images. We report a case in which a delayed enhanced MR image showed that the entire mass enhanced homogeneously resulting in loss of zonal distinction on early enhanced MR image. (orig.)

Wakefield accelerator with hybrid plasma-dielectric structure of rectangular cross-section

International Nuclear Information System (INIS)

Kiselev, V.A.; Linnik, A.F.; Mirnyj, V.I.; Onishchenko, I.N.; Uskov, V.V.

2010-01-01

Increase of wakefield intensity at its excitation by a long train of relativistic electron bunches in the rectangular dielectric structure when it is filled with plasma of resonant density was experimentally observed. The first portion of the bunches, produced by electron linac 'Almaz-2', ionizes gas at atmospheric pressure so that plasma frequency becomes equal to bunch repetition frequency and to the frequency of principal Eigen mode of the dielectric structure. Excitation enhancement at such resonant conditions is being studied taking into account the improvement of bunch train propagation in the transit channel caused by charge compensation with plasma and the electrodynamics change of the dielectric structure at filling with plasma.

Plasmon resonance enhanced temperature-dependent photoluminescence of Si-V centers in diamond

Energy Technology Data Exchange (ETDEWEB)

Cheng, Shaoheng [State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012 (China); State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012 (China); Song, Jie; Wang, Qiliang; Liu, Junsong; Li, Hongdong, E-mail: hdli@jlu.edu.cn [State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012 (China); Zhang, Baolin [State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012 (China)

2015-11-23

Temperature dependent optical property of diamond has been considered as a very important factor for realizing high performance diamond-based optoelectronic devices. The photoluminescence feature of the zero phonon line of silicon-vacancy (Si-V) centers in Si-doped chemical vapor deposited single crystal diamond (SCD) with localized surface plasmon resonance (LSPR) induced by gold nanoparticles has been studied at temperatures ranging from liquid nitrogen temperature to 473 K, as compared with that of the SCD counterpart in absence of the LSPR. It is found that with LSPR the emission intensities of Si-V centers are significantly enhanced by factors of tens and the magnitudes of the redshift (width) of the emissions become smaller (narrower), in comparison with those of normal emissions without plasmon resonance. More interestingly, these strong Si-V emissions appear remarkably at temperatures up to 473 K, while the spectral feature was not reported in previous studies on the intrinsic Si-doped diamonds when temperatures are higher than room temperature. These findings would lead to reaching high performance diamond-based devices, such as single photon emitter, quantum cryptography, biomarker, and so forth, working under high temperature conditions.

Ultra-Trace Chemical Sensing with Long-Wave Infrared Cavity-Enhanced Spectroscopic Sensors

Energy Technology Data Exchange (ETDEWEB)

Taubman, Matthew S.; Myers, Tanya L.; Cannon, Bret D.; Williams, Richard M.; Schultz, John F.

2003-02-20

are offset by the superior performance, ma-turity, and robustness of SWIR lasers, detectors, and other components, while the reverse is true for the MWIR and LWIR bands. PNNL's research activities include identification of signature chemicals and quantification of their spectroscopy, exploration of novel sensing techniques, and experimental sensor system construction and testing. In FY02, experimental QC laser systems developed with DARPA funding were used to explore continuous-wave (cw) CES in various forms culminating in the NICE-OHMS technique [1-3] discussed below. In FY02 PNNL also built an SWIR sensor to validate utility of the SWIR spectral region for chemical sensing, and explore the science and engineering of CES in field environments. The remainder of this report is devoted to PNNL's LWIR CES research. During FY02 PNNL explored the performance and limitations of several detection tech-niques in the LWIR including direct cavity-enhanced absorption, cavity-dithered phase-sensitive detection and resonant sideband cavity-enhanced detection. This latter tech-nique is also known as NICE-OHMS, which stands for Noise-Immune Cavity-Enhanced Optical Heterodyne Molecular Spectroscopy. This technique, pioneered in the near infra-red (NIR) by Dr J. Hall and coworkers at the University of Colorado, is one of the most sensitive spectroscopic techniques currently known. In this report, the first demonstra-tion of this technique in the LWIR is presented.

Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition

CERN Document Server

Kim, H

2002-01-01

We have investigated the growth kinetics of plasma-enhanced Ti atomic layer deposition (ALD) using a quartz crystal microbalance. Ti ALD films were grown at temperatures from 20 to 200 deg. C using TiCl sub 4 as a source gas and rf plasma-produced atomic H as the reducing agent. Postdeposition ex situ chemical analyses of thin films showed that the main impurity is oxygen, mostly incorporated during the air exposure prior to analysis. The thickness per cycle, corresponding to the growth rate, was measured by quartz crystal microbalance as a function of various key growth parameters, including TiCl sub 4 and H exposure time, rf plasma power, and sample temperature. The growth rates were independent of TiCl sub 4 exposure above 1x10 sup 3 L, indicating typical ALD mode growth. The key kinetic parameters for Cl extraction reaction and TiCl sub 4 adsorption kinetics were obtained and the growth kinetics were modeled to predict the growth rates based upon these results. Also, the dependency of growth kinetics on d...

Integrated optics ring-resonator chemical sensor for detection of air contamination

Science.gov (United States)

Manfreda, A. M.; Homer, M. L.; Ksendzov, A.

2004-01-01

We report a silicon nitride-based ring resonator chemical sensor with sensing polymer coating. Its sensitivity to isopropanol in air is at least 50 ppm - well under the permissible exposure level of 400 ppm.

Intregrated optics ring-resonator chemical sensor for detection of air contamination

Science.gov (United States)

Ksendzov, Alexander; Homer, Margie L.; Manfreda, Allison M.

2004-01-01

We report a silicon nitride-based ring resonator chemical sensor with sensing polymer coating. Its sensitivity to isopropanol in air is at least 50 ppm - well under the permissible exposure level of 400 ppm.

Shape of the Hα emission line in non resonant charge exchange in hydrogen plasmas

International Nuclear Information System (INIS)

Susino Bueno, A.; Zurro Hernandez, B.

1977-01-01

The Hα line shape emitted from a maxwellian hydrogen plasma and produced by non resonant change exchange has been calculated. Its explicit shape depends on the ion temperature, on background neutral energy and on the relative shape of the collision cross section. A comparison between theoretical and experimental shapes of the Hα line is carried out to check the model and to deduce the ion plasma temperature. (author) [es

Fundamental aspects of plasma chemical physics kinetics

CERN Document Server

Capitelli, Mario; Colonna, Gianpiero; Esposito, Fabrizio; Gorse, Claudine; Hassouni, Khaled; Laricchiuta, Annarita; Longo, Savino

2016-01-01

Describing non-equilibrium "cold" plasmas through a chemical physics approach, this book uses the state-to-state plasma kinetics, which considers each internal state as a new species with its own cross sections. Extended atomic and molecular master equations are coupled with Boltzmann and Monte Carlo methods to solve the electron energy distribution function. Selected examples in different applied fields, such as microelectronics, fusion, and aerospace, are presented and discussed including the self-consistent kinetics in RF parallel plate reactors, the optimization of negative ion sources and the expansion of high enthalpy flows through nozzles of different geometries. The book will cover the main aspects of the state-to-state kinetic approach for the description of nonequilibrium cold plasmas, illustrating the more recent achievements in the development of kinetic models including the self-consistent coupling of master equations and Boltzmann equation for electron dynamics. To give a complete portrayal, the...

Microwave plasma for materials treatment; Plasmas de microondas para tratamiento de materiales

Energy Technology Data Exchange (ETDEWEB)

Camps, E.; Garcia, J.L.; Muhl, S.; Alvarez F, O.; Chavez C, J. [Instituto Nacional de Investigaciones Nucleares, A.P. 18-1027, 11801 Mexico D.F. (Mexico)

1997-07-01

The microwave discharges of the Electron Cyclotron Resonance (Ecr) type are capable to generate plasma with relatively high ionization coefficients which can vary between 1 and 10 % also they are realized in low pressures at 10 {sup -4} Torr. order generating at this time high concentrations of neutral excited chemical species which result in that the chemical processes can be realized with much greater velocity as in another systems. In this work it was studied and characterized a microwave discharge type Ecr using for this electric probes and optical emission spectroscopy. The characterization was carried out with the purpose of optimizing the plasma parameters and to establish a control over the same one doing so that the experiments have a greater reproducibility and a major work efficiency. (Author)

Resonant cavity enhanced multi-analyte sensing

Science.gov (United States)

Bergstein, David Alan

Biological research and medicine increasingly depend on interrogating binding interactions among small segments of DNA, RNA, protein, and bio-specific small molecules. Microarray technology, which senses the affinity for target molecules in solution for a multiplicity of capturing agents fixed to a surface, has been used in biological research for gene expression profiling and in medicine for molecular biomarker detection. Label-free affinity sensing is preferable as it avoids fluorescent labeling of the target molecules, reducing test cost and variability. The Resonant Cavity Imaging Biosensor (RCIB) is a label-free optical inference based technique introduced that scales readily to high throughput and employs an optical resonant cavity to enhance sensitivity by a factor of 100 or more. Near-infrared light centered at 1512.5 nm couples resonantly through a cavity constructed from Si/SiO2 Bragg reflectors, one of which serves as the binding surface. As the wavelength is swept 5 nm, an Indium-Gallium-Arsenide digital camera monitors cavity transmittance at each pixel with resolution 128 x 128. A wavelength shift in the local resonant response of the optical cavity indicates binding. Positioning the sensing surface with respect to the standing wave pattern of the electric field within the cavity, one can control the sensitivity of the measurement to the presence of bound molecules thereby enhancing or suppressing sensitivity where appropriate. Transmitted intensity at thousands of pixel locations are recorded simultaneously in a 10 s, 5 nm scan. An initial proof-of-principle setup was constructed. A sample was fabricated with 25, 100 mum wide square regions, each with a different density of 1 mum square depressions etched 12 nm into the S1O 2 surface. The average depth of each etched region was found with 0.05 nm RMS precision when the sample remains loaded in the setup and 0.3 nm RMS precision when the sample is removed and replaced. Selective binding of the protein

Thermal expansion coefficient and thermomechanical properties of SiN(x) thin films prepared by plasma-enhanced chemical vapor deposition.

Science.gov (United States)

Tien, Chuen-Lin; Lin, Tsai-Wei

2012-10-20

We present a new method based on fast Fourier transform (FFT) for evaluating the thermal expansion coefficient and thermomechanical properties of thin films. The silicon nitride thin films deposited on Corning glass and Si wafers were prepared by plasma-enhanced chemical vapor deposition in this study. The anisotropic residual stress and thermomechanical properties of silicon nitride thin films were studied. Residual stresses in thin films were measured by a modified Michelson interferometer associated with the FFT method under different heating temperatures. We found that the average residual-stress value increases when the temperature increases from room temperature to 100°C. Increased substrate temperature causes the residual stress in SiN(x) film deposited on Si wafers to be more compressive, but the residual stress in SiN(x) film on Corning glass becomes more tensile. The residual-stress versus substrate-temperature relation is a linear correlation after heating. A double substrate technique is used to determine the thermal expansion coefficients of the thin films. The experimental results show that the thermal expansion coefficient of the silicon nitride thin films is 3.27×10(-6)°C(-1). The biaxial modulus is 1125 GPa for SiN(x) film.

A PMMA coated PMN–PT single crystal resonator for sensing chemical agents

International Nuclear Information System (INIS)

Frank, Michael; Kassegne, Sam; Moon, Kee S

2010-01-01

A highly sensitive lead magnesium niobate–lead titanate (PMN–PT) single crystal resonator coated with a thin film of polymethylmethacrylate (PMMA) useful for detecting chemical agents such as acetone, methanol, and isopropyl alcohol is presented. Swelling of the cured PMMA polymer layer in the presence of acetone, methanol, and isopropyl alcohol vapors is sensed as a mass change transduced to an electrical signal by the PMN–PT thickness shear mode sensor. Frequency change in the PMN–PT sensor is demonstrated to vary according to the concentration of the chemical vapor present within the sensing chamber. For acetone, the results indicate a frequency change more than 6000 times greater than that which would be expected from a quartz crystal microbalance coated with PMMA. This study is the first of its kind to demonstrate vapor loading of adsorbed chemical agents onto a polymer coated PMN–PT resonator

ICRF-enhanced plasma potentials in the SOL of Alcator C-Mod

Energy Technology Data Exchange (ETDEWEB)

Ochoukov, R.; Whyte, D. G.; Brunner, D.; LaBombard, B.; Lipschultz, B.; Terry, J. L.; Wukitch, S. J. [PSFC MIT, NW17, 175 Albany Street, Cambridge, MA 02139 (United States); D' Ippolito, D. A.; Myra, J. R. [Lodestar Research Corporation, 2400 Central Avenue, Boulder, Colorado 80301 (United States)

2014-02-12

We performed an extensive survey of the plasma potential in the scrape-off layer (SOL) of Ion Cyclotron Range-of Frequencies (ICRF)-heated discharges on Alcator C-Mod. Our results show that plasma potentials are enhanced in the presence of ICRF power and plasma potential values of >100 V are often observed. Such potentials are high enough to induce sputtering of high-Z molybdenum (Mo) plasma facing components by deuterium ions on C-Mod. For comparison, the plasma potential in Ohmic discharges is typically less than 10 V, well below the threshold needed to induce Mo sputtering by deuterium ions. ICRF-enhanced plasma potentials are observed in the SOL regions that both magnetically map and do not map to active ICRF antennas. Regions that magnetically map to active ICRF antennas are accessible to slow waves directly launched by the antennas and these regions experience plasma potential enhancement that is partially consistent with the slow wave rectification mechanism. One of the most defining features of the slow wave rectification is a threshold appearance of significant plasma potentials (>100 V) when the dimensionless rectification parameter Λ{sub −o} is above unity and this trend is observed experimentally. We also observe ICRF-enhanced plasma potentials >100 V in regions that do not magnetically map to the active antennas and, hence, are not accessible for slow waves launched directly by the active antennas. However, unabsorbed fast waves can reach these regions. The general trend that we observe in these 'un-mapped' regions is that the plasma potential scales with the strength of the local RF wave fields with the fast wave polarization and the highest plasma potentials are observed in discharges with the highest levels of unabsorbed ICRF power. Similarly, we find that core Mo levels scale with the level of unabsorbed ICRF power suggesting a link between plasma potentials in the SOL and the strength of the impurity source.

Raman scattering enhancement in photon-plasmon resonance mediated metal-dielectric microcavity

International Nuclear Information System (INIS)

Guddala, Sriram; Narayana Rao, D.; Dwivedi, Vindesh K.; Vijaya Prakash, G.

2013-01-01

Here, we report the photon-plasmon interaction scheme and enhanced field strengths resulted into the amplification of phonon in a novel microcavity. A metal-dielectric microcavity, with unified cavity photonic mode and localized surface plasmon resonances, is visualized by impregnating the gold nanoparticles into the deep see-through nano-sized pores of porous silicon microcavity. The intense optical field strengths resulting from the photon-plasmon interactions are probed by both resonant and non-resonant Raman scattering experiments. Due to photon-plasmon-phonon interaction mechanism, several orders of enhancement in the intensity of scattered Raman Stokes photon (at 500 cm −1 ) are observed. Our metal nanoparticle-microcavity hybrid system shows the potential to improve the sensing figure of merit as well as the applications of plasmonics for optoelectronics, photovoltaics, and related technologies

Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition

International Nuclear Information System (INIS)

Li Liuhe; Lu Qiuyuan; Fu, Ricky K.Y.; Chu, Paul K.