WorldWideScience

Sample records for remote plasma chemical

  1. Remote plasma enhanced chemical vapor deposition of GaP with in situ generation of phosphine precursors

    Science.gov (United States)

    Choi, S. W.; Lucovsky, G.; Bachmann, K. J.

    1992-01-01

    Thin homoepitaxial films of gallium phosphide (GaP) have been grown by remote plasma enhanced chemical vapor deposition utilizing in situ-generated phosphine precursors. The GaP forming reaction is kinetically controlled with an activation energy of 0.65 eV. The increase of the growth rate with increasing radio frequency (RF) power between 20 and 100 W is due to the combined effects of increasingly complete excitation and the spatial extension of the glow discharge toward the substrate; however, the saturation of the growth rate at even higher RF power indicates the saturation of the generation rate of phosphine precursors at this condition. Slight interdiffusion of P into Si and Si into GaP is indicated from GaP/Si heterostructures grown under similar conditions as the GaP homojunctions.

  2. Remote plasma enhanced chemical vapor deposition of GaP with in situ generation of phosphine precursors

    Science.gov (United States)

    Choi, S. W.; Lucovsky, G.; Bachmann, Klaus J.

    1993-01-01

    Thin homoepitaxial films of gallium phosphide (GaP) were grown by remote plasma enhanced chemical vapor deposition utilizing in situ generated phosphine precursors. The GaP forming reaction is kinetically controlled with an activation energy of 0.65 eV. The increase of the growth rate with increasing radio frequency (rf) power between 20 and 100 W is due to the combined effects of increasingly complete excitation and the spatial extension of the glow discharge toward the substrate, however, the saturation of the growth rate at even higher rf power indicates the saturation of the generation rate of phosphine precursors at this condition. Slight interdiffusion of P into Si and Si into GaP is indicated from GaP/Si heterostructures grown under similar conditions as the GaP homojunctions.

  3. Gas phase optical emission spectroscopy during remote plasma chemical vapour deposition of GaN and relation to the growth dynamics

    Energy Technology Data Exchange (ETDEWEB)

    Corr, Cormac; Boswell, Rod [Space Plasma, Power and Propulsion Group, Plasma Research Laboratory, Research School of Physics and Engineering, Australian National University, Canberra 0200 (Australia); Carman, Robert [Physics Department, Macquarie University, North Ryde, Sydney, NSW 2109 (Australia)

    2011-02-02

    A remote plasma chemical vapour deposition (RPCVD) system for the growth of gallium nitride (GaN) thin films is investigated using optical emission spectroscopy (OES). The intensities of the various excited species in pure nitrogen as well as nitrogen/hydrogen plasmas are correlated with GaN film growth characteristics. We show a correlation between the plasma source spectrum, the downstream spectrum where trimethylgallium is introduced and the GaN film quality. In particular, we investigate the addition of hydrogen, which greatly affects the gas phase species and the GaN film characteristics. OES is demonstrated to be a valuable monitoring tool in a RPCVD system for optimization of GaN growth.

  4. Generation and remote delivery of plasma activated species

    Science.gov (United States)

    Maguire, Paul; Mahony, Charles; Kelsey, Colin; Rutherford, David; Mariotti, Davide; Macias-Montero, Manuel; Perez-Martin, Fatima; Diver, Declan

    2016-09-01

    Plasma interactions with microdroplets offer new opportunities to deliver active chemical agents and nanoparticles to remote substrates downstream with many potential applications from cancer theranostics and wound healing in biomedicine, gentle food decontamination and seed germination in plasma agriculture to catalyst production and photonic structures fabrication, among others. We demonstrate plasma-liquid based pristine nanomaterials synthesis in flight and subsequent delivery up to 120mm from the atmospheric pressure plasma source. Monosized and non-aggregating metal nanoparticles are formed in the rf plasma in less than 100us, representing an increase in precursor reduction rate that is many (>4) orders of magnitude faster than that observed with standard colloidal chemistry or via high energy radiolytic techniques. Also the collection and purification limitations of the latter are avoided. Plasma activated liquid including OH radicals and H2O2 are transported over 120mm and have demonstrated high efficacy bacterial decontamination. These results will be compared with charge species and radical transport from the rf plasma without microdroplets. Reaction models based on high solvated surface electron concentrations will be presented. Funding from EPSRC acknowledged (Grants EP/K006088/1 and EP/K006142/1).

  5. Studies of Wettability of Medical PVC by Remote Nitrogen Plasma

    Science.gov (United States)

    Li, Ru; Chen, Jierong

    2006-05-01

    The effects of remote nitrogen plasma and nitrogen plasma on medical PVC's surface modification are studied. The surface properties are characterized by the contact angle measurement, X-ray photoelectron spectroscopy and scanning electron microscopy. Results show that the remote nitrogen plasma treatments modify the PVC surface in both morphology and composition and the treatment by the remote nitrogen plasma in PVC surface modification is more effective than that by the nitrogen plasma. Remote nitrogen plasma can modify the surface more uniformly. After the PVC surface is treated for 2 min by remote nitrogen plasma, the [w(O)+ w(N)]/w(C)] value increases from 0.13 to 0.51 and the water contact angle decreases from 89o to 18o.

  6. Remote Chemical Sensing Using Quantum Cascade Lasers

    Energy Technology Data Exchange (ETDEWEB)

    Harper, Warren W.; Schultz, John F.

    2003-01-30

    Spectroscopic chemical sensing research at Pacific Northwest National Laboratory (PNNL) is focused on developing advanced sensors for detecting the production of nuclear, chemical, or biological weapons; use of chemical weapons; or the presence of explosives, firearms, narcotics, or other contraband of significance to homeland security in airports, cargo terminals, public buildings, or other sensitive locations. For most of these missions, the signature chemicals are expected to occur in very low concentrations, and in mixture with ambient air or airborne waste streams that contain large numbers of other species that may interfere with spectroscopic detection, or be mistaken for signatures of illicit activity. PNNL’s emphasis is therefore on developing remote and sampling sensors with extreme sensitivity, and resistance to interferents, or selectivity. PNNL’s research activities include: 1. Identification of signature chemicals and quantification of their spectral characteristics, 2. Identification and development of laser and other technologies that enable breakthroughs in sensitivity and selectivity, 3. Development of promising sensing techniques through experimentation and modeling the physical phenomenology and practical engineering limitations affecting their performance, and 4. Development and testing of data collection methods and analysis algorithms. Close coordination of all aspects of the research is important to ensure that all parts are focused on productive avenues of investigation. Close coordination of experimental development and numerical modeling is particularly important because the theoretical component provides understanding and predictive capability, while the experiments validate calculations and ensure that all phenomena and engineering limitations are considered.

  7. On the intrinsic moisture permeation rate of remote microwave plasma-deposited silicon nitride layers

    NARCIS (Netherlands)

    Assche, F.J.H. Van; Unnikrishnan, S.; Michels, J.J.; Mol, A.M.B. van; Weijer, P. van de; Sanden, M.C.M. van de; Creatore, M.

    2014-01-01

    We report on a low substrate temperature (110°C) remote microwave plasma-enhanced chemical vapor deposition (PECVD) process of silicon nitride barrier layers against moisture permeation for organic light emitting diodes (OLEDs) and other moisture sensitive devices such as organic photovoltaic cells

  8. Remote Plasma Oxidation and Atomic Layer Etching of MoS2.

    Science.gov (United States)

    Zhu, Hui; Qin, Xiaoye; Cheng, Lanxia; Azcatl, Angelica; Kim, Jiyoung; Wallace, Robert M

    2016-07-27

    Exfoliated molybdenum disulfide (MoS2) is shown to chemically oxidize in a layered manner upon exposure to a remote O2 plasma. X-ray photoelectron spectroscopy (XPS), low energy electron diffraction (LEED), and atomic force microscopy (AFM) are employed to characterize the surface chemistry, structure, and topography of the oxidation process and indicate that the oxidation mainly occurs on the topmost layer without altering the chemical composition of underlying layer. The formation of S-O bonds upon short, remote plasma exposure pins the surface Fermi level to the conduction band edge, while the MoOx formation at high temperature modulates the Fermi level toward the valence band through band alignment. A uniform coverage of monolayer amorphous MoO3 is obtained after 5 min or longer remote O2 plasma exposure at 200 °C, and the MoO3 can be completely removed by annealing at 500 °C, leaving a clean ordered MoS2 lattice structure as verified by XPS, LEED, AFM, and scanning tunneling microscopy. This work shows that a remote O2 plasma can be useful for both surface functionalization and a controlled thinning method for MoS2 device fabrication processes.

  9. A Comparative Study of Hydrophilic Modification of Polypropylene Membranes by Remote and Direct Ar Plasma

    Institute of Scientific and Technical Information of China (English)

    ZHANG Suzhen; CHENG Cheng; LAN Yan; MENG Yuedong

    2009-01-01

    Surface modification of polypropylene membrane by argon (Ar) plasma-induced graft polymerization with hydrophilic monomer [acrylic acid (AA) in this work]was investigated.It was found that both the distance of the membrane from the Ar plasma center and the plasma power had a strong influence on the surface modification,hydrophilicity and graft yield (GY) of the treated membrane.Results suggest that remote plasma treatment with a proper sample position,plasma power and graft polymerization leads to a membrane surface with not only less damage,but also more permanent hydrophilicity,than direct plasma treatment does.By analyzing the morphology and the chemical composition of the membrane surface by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS),as well as Fourier transform infrared attenuated total reflection spectroscopy (FTIR-ATR) respectively,a possible mechanism was tentatively revealed.

  10. Fundamental aspects of plasma chemical physics Thermodynamics

    CERN Document Server

    Capitelli, Mario; D'Angola, Antonio

    2012-01-01

    Fundamental Aspects of Plasma Chemical Physics - Thermodynamics develops basic and advanced concepts of plasma thermodynamics from both classical and statistical points of view. After a refreshment of classical thermodynamics applied to the dissociation and ionization regimes, the book invites the reader to discover the role of electronic excitation in affecting the properties of plasmas, a topic often overlooked by the thermal plasma community. Particular attention is devoted to the problem of the divergence of the partition function of atomic species and the state-to-state approach for calculating the partition function of diatomic and polyatomic molecules. The limit of ideal gas approximation is also discussed, by introducing Debye-Huckel and virial corrections. Throughout the book, worked examples are given in order to clarify concepts and mathematical approaches. This book is a first of a series of three books to be published by the authors on fundamental aspects of plasma chemical physics.  The next bo...

  11. Proliferation detection using a remote resonance Raman chemical sensor

    Energy Technology Data Exchange (ETDEWEB)

    Sedlacek, A.J.; Chen, C.L.; Dougherty, D.R.

    1993-08-01

    The authors discussed the potential of the resonance Raman chemical sensor as a remote sensor that can be used for gases, liquids or solids. This spectroscopy has the fundamental advantage that it is based on optical fingerprints that are insensitive to environmental perturbations or excitation frequency. By taking advantage of resonance enhancement, the inelastic scattering cross-section can increase anywhere from 4 to 6 orders of magnitude which translates into increased sensing range or lower detection limits. It was also shown that differential cross-sections as small as 10{sup {minus}27} cm{sup 2}/sr do not preclude the use of this technique as being an important component in one`s remote-sensing arsenal. The results obtained in the early 1970s on various pollutants and the more recent work on atmospheric water cast a favorable light on the prospects for the successful development of a resonance Raman remote sensor. Currently, of the 20 CW agent-related {open_quotes}signature{close_quotes} chemicals that the authors have investigated, 18 show enhancements ranging from 3 to 6 orders of magnitude. The absolute magnitudes of the measured resonance enhanced Raman cross-sections for these 18 chemicals suggest that detection and identification of trace quantities of the {open_quotes}signature{close_quotes} chemicals, through a remote resonance Raman chemical sensor, could be achieved.

  12. Remote network control plasma diagnostic system for Tokamak T-10

    Science.gov (United States)

    Troynov, V. I.; Zimin, A. M.; Krupin, V. A.; Notkin, G. E.; Nurgaliev, M. R.

    2016-09-01

    The parameters of molecular plasma in closed magnetic trap is studied in this paper. Using the system of molecular diagnostics, which was designed by the authors on the «Tokamak T-10» facility, the radiation of hydrogen isotopes at the plasma edge is investigated. The scheme of optical radiation registration within visible spectrum is described. For visualization, identification and processing of registered molecular spectra a new software is developed using MatLab environment. The software also includes electronic atlas of electronic-vibrational-rotational transitions for molecules of protium and deuterium. To register radiation from limiter cross-section a network control system is designed using the means of the Internet/Intranet. Remote control system diagram and methods are given. The examples of web-interfaces for working out equipment control scenarios and viewing of results are provided. After test run in Intranet, the remote diagnostic system will be accessible through Internet.

  13. Fundamental aspects of plasma chemical physics transport

    CERN Document Server

    Capitelli, Mario; Laricchiuta, Annarita

    2013-01-01

    Fundamental Aspects of Plasma Chemical Physics: Tranpsort develops basic and advanced concepts of plasma transport to the modern treatment of the Chapman-Enskog method for the solution of the Boltzmann transport equation. The book invites the reader to consider actual problems of the transport of thermal plasmas with particular attention to the derivation of diffusion- and viscosity-type transport cross sections, stressing the role of resonant charge-exchange processes in affecting the diffusion-type collision calculation of viscosity-type collision integrals. A wide range of topics is then discussed including (1) the effect of non-equilibrium vibrational distributions on the transport of vibrational energy, (2) the role of electronically excited states in the transport properties of thermal plasmas, (3) the dependence of transport properties on the multitude of Saha equations for multi-temperature plasmas, and (4) the effect of the magnetic field on transport properties. Throughout the book, worked examples ...

  14. Chemical Fractionation and Abundances in Coronal Plasma

    CERN Document Server

    Drake, J J

    2003-01-01

    Much of modern astrophysics is grounded on the observed chemical compositions of stars and the diffuse plasma that pervades the space between stars, galaxies and clusters of galaxies. X-ray and EUV spectra of the hot plasma in the outer atmospheres of stars have demonstrated that these environments are subject to chemical fractionation in which the abundances of elements can be enhanced and depleted by an order of magnitude or more. These coronal abundance anomalies are discussed and some of the physical mechanisms that might be responsible for producing them are examined. It is argued that coronal abundances can provide important new diagnostics on physical processes at work in solar and stellar coronae. It seems likely that other hot astrophysical plasmas will be subject to similar effects.

  15. Comparison of Plasma Activation of Thin Water Layers by Direct and Remote Plasma Sources

    Science.gov (United States)

    Kushner, Mark

    2014-10-01

    Plasma activation of liquids is now being investigated for a variety of biomedical applications. The plasma sources used for this activation can be generally classified as direct (the plasma is in contact with the surface of the liquid) or remote (the plasma does not directly touch the liquid). The direct plasma source may be a dielectric barrier discharge (DBD) where the surface of the liquid is a floating electrode or a plasma jet in which the ionization wave forming the plasma plume reaches the liquid. The remote plasma source may be a DBD with electrodes electrically isolated from the liquid or a plasma jet in which the ionization wave in the plume does not reach the liquid. In this paper, a comparison of activation of thin water layers on top of tissue, as might be encountered in wound healing, will be discussed using results from numerical investigations. We used the modeling platform nonPDPSIM to simulate direct plasma activation of thin water layers using DBDs and remote activation using plasma jets using up to hundreds of pulses. The DBDs are sustained in humid air while the plasma jets consist of He/O2 mixtures flowed into humid air. For similar number of pulses and energy deposition, the direct DBD plasma sources produce more acidification and higher production of nitrates/nitrites in the liquid. This is due to the accumulation of NxOy plasma jets, the convective flow removes many of these species prior to their diffusing into the water or reacting to form higher nitrogen oxides. This latter effect is sensitive to the repetition rate which determines whether reactive species formed during prior pulses overlap with newly produced reactive species. in the gas phase. In the plasma jets, the convective flow removes many of these species prior to their diffusing into the water or reacting to form higher nitrogen oxides. This latter effect is sensitive to the repetition rate which determines whether reactive species formed during prior pulses overlap with

  16. Fundamental aspects of plasma chemical physics kinetics

    CERN Document Server

    Capitelli, Mario; Colonna, Gianpiero; Esposito, Fabrizio; Gorse, Claudine; Hassouni, Khaled; Laricchiuta, Annarita; Longo, Savino

    2016-01-01

    Describing non-equilibrium "cold" plasmas through a chemical physics approach, this book uses the state-to-state plasma kinetics, which considers each internal state as a new species with its own cross sections. Extended atomic and molecular master equations are coupled with Boltzmann and Monte Carlo methods to solve the electron energy distribution function. Selected examples in different applied fields, such as microelectronics, fusion, and aerospace, are presented and discussed including the self-consistent kinetics in RF parallel plate reactors, the optimization of negative ion sources and the expansion of high enthalpy flows through nozzles of different geometries. The book will cover the main aspects of the state-to-state kinetic approach for the description of nonequilibrium cold plasmas, illustrating the more recent achievements in the development of kinetic models including the self-consistent coupling of master equations and Boltzmann equation for electron dynamics. To give a complete portrayal, the...

  17. Frequency Modulation Spectroscopy Modeling for Remote Chemical Detection

    Energy Technology Data Exchange (ETDEWEB)

    Sheen, David M.

    2000-09-30

    Frequency modulation (FM) spectroscopy techniques show promise for active infrared remote chemical sensing. FM spectroscopy techniques have reduced sensitivity to optical and electronic noise, and are relatively immune to the effects of various electronic and mechanical drifts. FM systems are responsive to sharp spectral features and can therefore reduce the effects of spectral clutter due to interfering chemicals in the plume or in the atmosphere. The relatively high modulation frequencies used for FM also reduces the effects of albedo (reflectance) and plume variations. Conventional differential absorption lidar (DIAL) systems are performance limited by the noise induced by speckle. Analysis presented in this report shows that FM based sensors may reduce the effects of speckle by one to two orders of magnitude. This can result in reduced dwell times and faster area searches, as well as reducing various forms of spatial clutter. FM systems will require a laser system that is continuously tunable at relatively high frequencies (0.1 to 20 MHz). One promising candidate is the quantum-cascade (QC) laser [1, 2]. The QC laser is potentially capable of power levels on the order of 1 Watt and frequency tuning on the order of 3 - 6 GHz, which is the performance level required for FM spectroscopy based remote sensing. In this report we describe a high-level numerical model for an FM spectroscopy based remote sensing system, and application to two unmanned airborne vehicle (UAV) scenarios. A Predator scenario operating at a slant range of 6.5 km with a 10 cm diameter telescope, and a Global Hawk scenario operating at a range of 30 km with a 20 cm diameter telescope, has been assumed to allow estimation of the performance of potential FM systems.

  18. Remote sensing of a low pressure plasma in the radio near field

    Science.gov (United States)

    Kelly, Seán; McNally, Patrick J.

    2017-09-01

    A novel approach to remotely monitor low pressure non-equilibrium plasmas is reported. A magnetic field antenna is positioned in the near field of a capacitively coupled plasma. Magnetic flux from plasma currents, present near the viewport, is intercepted by a calibrated loop antenna placed outside the chamber. The induced signal current is correlated to bulk plasma currents. The comparison of relative harmonic amplitudes shows resonance features for lower operating pressures. The geometric resonance and electron-neutral collision frequencies are evaluated from resonant harmonic features. This approach advances remote, noninvasive, and installation-free plasma monitoring, which is of particular interest to industrial scenarios.

  19. A Self-Calibrating Remote Control Chemical Monitoring System

    Energy Technology Data Exchange (ETDEWEB)

    Jessica Croft

    2007-06-01

    The Susie Mine, part of the Upper Tenmile Mining Area, is located in Rimini, MT about 15 miles southwest of Helena, MT. The Upper Tenmile Creek Mining Area is an EPA Superfund site with 70 abandoned hard rock mines and several residential yards prioritized for clean up. Water from the Susie mine flows into Tenmile Creek from which the city of Helena draws part of its water supply. MSE Technology Applications in Butte, Montana was contracted by the EPA to build a treatment system for the Susie mine effluent and demonstrate a system capable of treating mine waste water in remote locations. The Idaho National Lab was contracted to design, build and demonstrate a low maintenance self-calibrating monitoring system that would monitor multiple sample points, allow remote two-way communications with the control software and allow access to the collected data through a web site. The Automated Chemical Analysis Monitoring (ACAM) system was installed in December 2006. This thesis documents the overall design of the hardware, control software and website, the data collected while MSE-TA’s system was operational, the data collected after MSE-TA’s system was shut down and suggested improvements to the existing system.

  20. Physical-Chemical Characterization of Nanodispersed Powders Produced by a Plasma-Chemical Technique

    Institute of Scientific and Technical Information of China (English)

    M. GEORGIEVA; G. VISSOKOV; Iv. GRANCHAROV

    2007-01-01

    This article presents a review on the physical-chemical properties and characteristics of plasma-chemically produced nanodispersed powders (NDP), such as metals, oxides, nitrides, carbides, and catalysts. The plasma-chemical preparation of the powders was carried out in thermal plasma (TP) created by means of high-current electric arcs, plasma jets, high-frequency (HF) discharges, etc. We also discuss certain properties and characteristics of the NDPs, which are determined largely by the conditions of preparation.

  1. High-density formation of Ta nanodot induced by remote hydrogen plasma

    Science.gov (United States)

    Wang, Yaping; Takeuchi, Daichi; Ohta, Akio; Ikeda, Mitsuhisa; Makihara, Katsunori; Miyazaki, Seiichi

    2017-01-01

    We have studied the formation of Ta nanodots (NDs) on thermally grown SiO2/Si by exposing a thin metal layer to a remote H2 plasma (H2-RP) without external heating. Atomic force microscopy (AFM) analyses show that a combination of a Ge (˜30.0 nm)/Ta (˜2.0 nm) bilayer stack with subsequent H2-RP exposure is effective for forming electrically isolated Ta NDs with an areal dot density as high as ˜1011 cm-2, where the Ge layer plays an important role as a barrier layer against the oxidation of the ultrathin Ta layer surface. The change in the chemical structure of the Ge/Ta bilayer stack on SiO2/Si upon Ta ND formation by H2-RP exposure is investigated by hard X-ray photoemission spectroscopy (HAXPES) and X-ray photoelectron spectroscopy (XPS).

  2. Physics-electrical hybrid model for real time impedance matching and remote plasma characterization in RF plasma sources

    Science.gov (United States)

    Sudhir, Dass; Bandyopadhyay, M.; Chakraborty, A.

    2016-02-01

    Plasma characterization and impedance matching are an integral part of any radio frequency (RF) based plasma source. In long pulse operation, particularly in high power operation where plasma load may vary due to different reasons (e.g. pressure and power), online tuning of impedance matching circuit and remote plasma density estimation are very useful. In some cases, due to remote interfaces, radio activation and, due to maintenance issues, power probes are not allowed to be incorporated in the ion source design for plasma characterization. Therefore, for characterization and impedance matching, more remote schemes are envisaged. Two such schemes by the same authors are suggested in these regards, which are based on air core transformer model of inductive coupled plasma (ICP) [M. Bandyopadhyay et al., Nucl. Fusion 55, 033017 (2015); D. Sudhir et al., Rev. Sci. Instrum. 85, 013510 (2014)]. However, the influence of the RF field interaction with the plasma to determine its impedance, a physics code HELIC [D. Arnush, Phys. Plasmas 7, 3042 (2000)] is coupled with the transformer model. This model can be useful for both types of RF sources, i.e., ICP and helicon sources.

  3. Physics-electrical hybrid model for real time impedance matching and remote plasma characterization in RF plasma sources

    Energy Technology Data Exchange (ETDEWEB)

    Sudhir, Dass, E-mail: dass.sudhir@iter-india.org; Bandyopadhyay, M.; Chakraborty, A. [ITER-India, Institute for Plasma Research, A-29 GIDC, Sec-25, Gandhinagar, 382016 Gujarat (India)

    2016-02-15

    Plasma characterization and impedance matching are an integral part of any radio frequency (RF) based plasma source. In long pulse operation, particularly in high power operation where plasma load may vary due to different reasons (e.g. pressure and power), online tuning of impedance matching circuit and remote plasma density estimation are very useful. In some cases, due to remote interfaces, radio activation and, due to maintenance issues, power probes are not allowed to be incorporated in the ion source design for plasma characterization. Therefore, for characterization and impedance matching, more remote schemes are envisaged. Two such schemes by the same authors are suggested in these regards, which are based on air core transformer model of inductive coupled plasma (ICP) [M. Bandyopadhyay et al., Nucl. Fusion 55, 033017 (2015); D. Sudhir et al., Rev. Sci. Instrum. 85, 013510 (2014)]. However, the influence of the RF field interaction with the plasma to determine its impedance, a physics code HELIC [D. Arnush, Phys. Plasmas 7, 3042 (2000)] is coupled with the transformer model. This model can be useful for both types of RF sources, i.e., ICP and helicon sources.

  4. Physics-electrical hybrid model for real time impedance matching and remote plasma characterization in RF plasma sources.

    Science.gov (United States)

    Sudhir, Dass; Bandyopadhyay, M; Chakraborty, A

    2016-02-01

    Plasma characterization and impedance matching are an integral part of any radio frequency (RF) based plasma source. In long pulse operation, particularly in high power operation where plasma load may vary due to different reasons (e.g. pressure and power), online tuning of impedance matching circuit and remote plasma density estimation are very useful. In some cases, due to remote interfaces, radio activation and, due to maintenance issues, power probes are not allowed to be incorporated in the ion source design for plasma characterization. Therefore, for characterization and impedance matching, more remote schemes are envisaged. Two such schemes by the same authors are suggested in these regards, which are based on air core transformer model of inductive coupled plasma (ICP) [M. Bandyopadhyay et al., Nucl. Fusion 55, 033017 (2015); D. Sudhir et al., Rev. Sci. Instrum. 85, 013510 (2014)]. However, the influence of the RF field interaction with the plasma to determine its impedance, a physics code HELIC [D. Arnush, Phys. Plasmas 7, 3042 (2000)] is coupled with the transformer model. This model can be useful for both types of RF sources, i.e., ICP and helicon sources.

  5. Strangeness Production in a Chemically Equilibrating Quark-Gluon Plasma

    Institute of Scientific and Technical Information of China (English)

    HE Ze-Jun; LONG Jia-Li; MA Yu-Gang; MA Guo-Liang

    2004-01-01

    @@ We study the strangeness of a chemically equilibrating quark-gluon plasma at finite baryon density based on the and will accelerate with the change of the initial system from a chemically non-equilibrated to an equilibrated system. We also find that the calculated strangeness is very different from the one in the thermodynamic equilibrium system. This study may be helpful to understand the formation of quark-gluon plasma via a chemically non-equilibrated evolution framework.

  6. Nanodispersed Oxides-Plasma-Chemical Synthesis and Properties

    Institute of Scientific and Technical Information of China (English)

    Gheorghi VISSOKOV; Katerina ZAHARIEVA

    2007-01-01

    We discuss the plasma-chemical synthesis and the properties of transition metals oxides, Al2O3, SiO2, rare-earth oxides, oxides for ceramics and metal-ceramics, and oxides used as catalysts. Bearing in mind the indisputable advantages of using plasma-chemically synthesized nanodispersed oxides for the needs of various industrial fields, we set out to review the articles published in the past few years devoted to the problems of plasma-chemical synthesis and characterization of nanodispersed oxides.

  7. On the Plasma-Chemical Synthesis of Nanopowders

    Institute of Scientific and Technical Information of China (English)

    G. Vissokov; Iv. Grancharov; Tsv. Tsvetanov

    2003-01-01

    This paper presents an overview of nanopowders preparation using low-temperature plasma (LTP). LTP with its unique processing capabilities provides an attractive and chemically unspecific route for powder synthesis. Nanopowders such as oxides, nitrides, carbides, catalysts and other nanopowders have been successfully synthesized in LTP reactors based on high intensity arcs, plasma jets and radio-frequency (r. f.) inductively coupled discharges.

  8. The shear viscosity of gauge theory plasma with chemical potentials

    CERN Document Server

    Benincasa, P; Naryshkin, R; Benincasa, Paolo; Buchel, Alex; Naryshkin, Roman

    2007-01-01

    We consider strongly coupled gauge theory plasma with conserved global charges that allow for a dual gravitational description. We study the shear viscosity of the gauge theory plasma in the presence of chemical potentials for these charges. Using gauge theory/string theory correspondence we prove that at large 't Hooft coupling the ratio of the shear viscosity to the entropy density is universal.

  9. The shear viscosity of gauge theory plasma with chemical potentials

    Science.gov (United States)

    Benincasa, Paolo; Buchel, Alex; Naryshkin, Roman

    2007-02-01

    We consider strongly coupled gauge theory plasma with conserved global charges that allow for a dual gravitational description. We study the shear viscosity of the gauge theory plasma in the presence of chemical potentials for these charges. Using gauge theory/string theory correspondence we prove that at large 't Hooft coupling the ratio of the shear viscosity to the entropy density is universal.

  10. [Improvement of PVC bio-carrier surface property by remote plasma].

    Science.gov (United States)

    Li, Ru; Chen, Jie-Rong; Chen, Jun; Yao, Xin

    2006-01-01

    The effects of various remote plasma, such as Ar, He, O2 and N2 on PVC bio-carrier surface modification were studied. The surface properties were characterized by the contact angle measurement and X-ray photoelectron spectroscopy (XPS). The role of all kinds of active species such as electrons, ions and free radicals involved in plasma surface modification were evaluated. Results show that the remote plasma treatments modify the PVC surface in both wettability and composition, the (O + N)/C of PVC surface increases from 7% to 22%, and the water contact angle decreases from 97 degrees to 15 degrees. The optimal results was achieved when plasma treatment parameters were set, that is treatment time 3 min, Ar flux at 20 cm3/s, power at 60W, sample position of 40 cm. The results show that the modified PVC Bio-carrier adhesion rate and capacity on the modified surface are greatly increased.

  11. Space Plasma Studies by In-Situ and Remote Measurements

    Science.gov (United States)

    2007-11-02

    Awarded by Lenin Prize (highest in USSR). 1962 Plasma experiments aboard KOSMOS 2, evidence of the lack of charged particles thermodynamic equilibrium...ionosphere of Venus. 1970- 1979 Ionospheric experiments aboard COSMOS 378, INTERCOSMOS 8,10,12,14,18,19 and KOSMOS 900. 1970- 1981 Series of in

  12. Investigation of the AC Plasma Torch Working Conditions for the Plasma Chemical Applications

    Science.gov (United States)

    Safronov, A. A.; Vasilieva, O. B.; Dudnik, J. D.; E Kuznetsov, V.; Shiryaev, V. N.; Subbotin, D. I.; Pavlov, A. V.

    2017-04-01

    The presented design and parameters of a three-phase AC plasma torch with the power up to 500 kW, flow rate of air 30-50 g/s (temperature up to 5000 K) could be used in different plasma chemical processes. Range of measured plasma temperature is 3500-5000 K. The paper presents investigations of the plasma torch operation modes for its application in plasma chemical technologies. Plasma chemical technologies for various purposes (processing, destruction of various wastes, including technological and hazardous waste, conversion or production of chemicals to obtain nanoscale materials, etc.) are very promising in terms of the process efficiency. Their industrial use is difficult due to the lack of inexpensive and reliable plasma torches providing the desired level of temperature, enthalpy of the working gas and other necessary conditions for the process. This problem can be solved using a considered design of a three-phase alternating current plasma torch with power of 150-500 kW with working gas flow rate of 30-50 g/s with mass average temperature up to 5000K on the basis of which an industrial plasma chemical plant can be created. The basis of the plasma torch operation is a railgun effect that is the principle of arc movement in the field of its own current field. Thanks to single supply of power to the arc, arcs forming in the discharge chamber of the plasma torch move along the electrodes under the action of electrodynamic forces resulting from the interaction of the arc current with its own magnetic field. Under the condition of the three-phase supply voltage, arc transits from the electrode to the electrode with change in the anodic and cathodic phases with frequency of 300 Hz. A special feature of this design is the ability to organize the movement of the arc attachment along the electrode, thus ensuring an even distribution of the thermal load and thus achieve long time of continuous operation of the plasma torch. The parameters of the plasma jet of the

  13. Modeling Chemical Detection Sensitivities of Active and Passive Remote Sensing Systems

    Energy Technology Data Exchange (ETDEWEB)

    Scharlemann, E T

    2003-07-28

    During nearly a decade of remote sensing programs under the auspices of the U. S. Department of Energy (DOE), LLNL has developed a set of performance modeling codes--called APRS--for both Active and Passive Remote Sensing systems. These codes emphasize chemical detection sensitivity in the form of minimum detectable quantities with and without background spectral clutter and in the possible presence of other interfering chemicals. The codes have been benchmarked against data acquired in both active and passive remote sensing programs at LLNL and Los Alamos National Laboratory (LANL). The codes include, as an integral part of the performance modeling, many of the data analysis techniques developed in the DOE's active and passive remote sensing programs (e.g., ''band normalization'' for an active system, principal component analysis for a passive system).

  14. Plasma parameters controlled by remote electron shower in a double plasma device

    Science.gov (United States)

    Mishra, M. K.; Phukan, A.

    2012-07-01

    The principal feature of this experiment is the electron showers consisting of three tungsten wires embedded by the plasma, which are heated up consequently emitting electrons inside the diffused plasma to control the plasma parameters in the discharge section of a double plasma device. These cold electrons emitted by the heated filament are free from maintenance of discharge which is sustained in the source section. The target plasma, where electrons are injected is produced as a result of diffusion from the source section. It is found that, plasma density and plasma potential can be effectively controlled in this way.

  15. Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber

    Energy Technology Data Exchange (ETDEWEB)

    Dechana, A. [Program of Physics and General Science, Faculty of Science and Technology, Songkhla Rajabhat University, Songkhla 90000 (Thailand); Thamboon, P. [Science and Technology Research Institute, Chiang Mai University, Chiang Mai 50200 (Thailand); Boonyawan, D., E-mail: dheerawan.b@cmu.ac.th [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand)

    2014-10-15

    A microwave remote Plasma Enhanced-Atomic Layer Deposition system with multicusp confinement chamber is established at the Plasma and Beam Physics research facilities, Chiang Mai, Thailand. The system produces highly-reactive plasma species in order to enhance the deposition process of thin films. The addition of the multicusp magnetic fields further improves the plasma density and uniformity in the reaction chamber. Thus, the system is more favorable to temperature-sensitive substrates when heating becomes unwanted. Furthermore, the remote-plasma feature, which is generated via microwave power source, offers tunability of the plasma properties separately from the process. As a result, the system provides high flexibility in choice of materials and design experiments, particularly for low-temperature applications. Performance evaluations of the system were carried on coating experiments of Al{sub 2}O{sub 3} layers onto a silicon wafer. The plasma characteristics in the chamber will be described. The resulted Al{sub 2}O{sub 3} films—analyzed by Rutherford Backscattering Spectrometry in channeling mode and by X-ray Photoelectron Spectroscopy techniques—will be discussed.

  16. Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber

    Science.gov (United States)

    Dechana, A.; Thamboon, P.; Boonyawan, D.

    2014-10-01

    A microwave remote Plasma Enhanced-Atomic Layer Deposition system with multicusp confinement chamber is established at the Plasma and Beam Physics research facilities, Chiang Mai, Thailand. The system produces highly-reactive plasma species in order to enhance the deposition process of thin films. The addition of the multicusp magnetic fields further improves the plasma density and uniformity in the reaction chamber. Thus, the system is more favorable to temperature-sensitive substrates when heating becomes unwanted. Furthermore, the remote-plasma feature, which is generated via microwave power source, offers tunability of the plasma properties separately from the process. As a result, the system provides high flexibility in choice of materials and design experiments, particularly for low-temperature applications. Performance evaluations of the system were carried on coating experiments of Al2O3 layers onto a silicon wafer. The plasma characteristics in the chamber will be described. The resulted Al2O3 films—analyzed by Rutherford Backscattering Spectrometry in channeling mode and by X-ray Photoelectron Spectroscopy techniques—will be discussed.

  17. The shear viscosity of gauge theory plasma with chemical potentials

    Energy Technology Data Exchange (ETDEWEB)

    Benincasa, Paolo [Department of Applied Mathematics, University of Western Ontario, London, Ontario N6A 5B7 (Canada); Buchel, Alex [Department of Applied Mathematics, University of Western Ontario, London, Ontario N6A 5B7 (Canada) and Perimeter Institute for Theoretical Physics, Waterloo, Ontario N2J 2W9 (Canada)]. E-mail: abuchel@perimeterinstitute.ca; Naryshkin, Roman [Department of Applied Mathematics, University of Western Ontario, London, Ontario N6A 5B7 (Canada); Physics Department, Taras Shevchenko Kiev National University, Prosp. Glushkova 6, Kiev 03022 (Ukraine)

    2007-02-08

    We consider strongly coupled gauge theory plasma with conserved global charges that allow for a dual gravitational description. We study the shear viscosity of the gauge theory plasma in the presence of chemical potentials for these charges. Using gauge theory/string theory correspondence we prove that at large 't Hooft coupling the ratio of the shear viscosity to the entropy density is universal.

  18. Chemical analysis of plasma-assisted antimicrobial treatment on cotton

    Science.gov (United States)

    Kan, C. W.; Lam, Y. L.; Yuen, C. W. M.; Luximon, A.; Lau, K. W.; Chen, K. S.

    2013-06-01

    This paper explores the use of plasma treatment as a pretreatment process to assist the application of antimicrobial process on cotton fabric with good functional effect. In this paper, antimicrobial finishing agent, Microfresh Liquid Formulation 9200-200 (MF), and a binder (polyurethane dispersion, Microban Liquid Formulation R10800-0, MB) will be used for treating the cotton fabric for improving the antimicrobial property and pre-treatment of cotton fabric by plasma under atmospheric pressure will be employed to improve loading of chemical agents. The chemical analysis of the treated cotton fabric will be conducted by Fourier transform Infrared Spectroscopy.

  19. Generator of chemically active low-temperature plasma

    Science.gov (United States)

    Tyuftyaev, A. S.; Gadzhiev, M. Kh; Sargsyan, M. A.; Demirov, N. A.; Spector, N. O.

    2016-11-01

    A new generator of high enthalpy (H 0 > 40 kJ/g), chemically active nitrogen and air plasmas was designed and constructed. Main feature of the generator is an expanding channel of an output electrode; the generator belongs to the class of DC plasma torches with thermionic cathode with an efficiency of 80%. The generator ensures the formation of a slightly divergent plasma jet (2α = 12°) with a diameter of D = 10-12 mm, an electric arc maximum power of 20-50 kW, plasma forming gas flow rate 1.0-2.0 g/s, and the average plasma temperature at an outlet of 8000-11000 K.

  20. Spatial distribution of the electrical potential and ion concentration in the downstream area of atmospheric pressure remote plasma

    Directory of Open Access Journals (Sweden)

    M. V. Mishin

    2014-10-01

    Full Text Available This paper presents the results from an experimental study of the ion flux characteristics behind the remote plasma zone in a vertical tube reaction chamber for atmospheric pressure plasma enhanced chemical vapor deposition. Capacitively coupled radio frequency plasma was generated in pure He and gas mixtures: He–Ar, He–O2, He–TEOS. We previously used the reaction system He–TEOS for the synthesis of self-assembled structures of silicon dioxide nanoparticles. It is likely that the electrical parameters of the area, where nanoparticles have been transported from the synthesis zone to the substrate, play a significant role in the self-organization processes both in the vapor phase and on the substrate surface. The results from the spatial distribution of the electrical potential and ion concentration in the discharge downstream area measured by means of the external probe of original design and the special data processing method are demonstrated in this work. Positive and negatives ions with maximum concentrations of 106–107 cm−3 have been found at 10–80 mm distance behind the plasma zone. On the basis of the revealed distributions for different gas mixtures, the physical model of the observed phenomena is proposed. The model illustrates the capability of the virtual ion emitter formation behind the discharge gap and the presence of an extremum of the electrical potential at the distance of approximately 10−2–10−1 mm from the grounded electrode.

  1. Hard graphitelike hydrogenated amorphous carbon grown at high rates by a remote plasma

    DEFF Research Database (Denmark)

    Singh, Shailendra Vikram; Zaharia, T.; Creatore, M.

    2010-01-01

    Hydrogenated amorphous carbon (a-C:H) deposited from an Ar-C 2H2 expanding thermal plasma chemical vapor deposition (ETP-CVD) is reported. The downstream plasma region of an ETP is characterized by a low electron temperature (∼0.3 eV), which leads to an ion driven chemistry and negligible physical...

  2. Mechanism of plasma ignition in electrothermal-chemical launcher

    Directory of Open Access Journals (Sweden)

    Yong Jin

    2016-04-01

    Full Text Available Plasma generator is a core component in an electrothermal-chemical (ETC launcher. Its work state directly influences the launch efficiency of a system. The interaction between plasma and propellants is a very important mechanism in ETC technology. Based on the transient radiation model and open air plasma jet experiment, the mechanism of plasma ignition process is analyzed. Results show that the surface temperature of local solid propellant grain can quickly achieve the ignition temperature under the action of early transient plasma radiation. But it needs enough time to maintain the high energy flow to make self-sustained combustion of solid propellant grains. Because of the limited space characteristics of transient radiation, the near-field propellant grains can gain enough energy by the strong transient radiation to be ignited and achieve self-sustained combustion. The far-field propellant grains mainly gain the energy by the activated particles in plasma jet to be ignited and self-sustained combustion. Experiments show that plasma jet always has a high flow velocity in the area of the cartridge. Compared with conventional ignition, the solid propellant grains can obtain more quick and uniform ignition and self-sustained combustion by this kind of ablation controlled arc (ACA plasma via energy skin effect of propellant grains, pre-heat temperature mechanism and high efficient jet diffusion.

  3. Mechanism of plasma ignition in electrothermal-chemical launcher

    Institute of Scientific and Technical Information of China (English)

    Yong JIN; Yan-jie NI; Hai-yuan LI; Bao-ming LI

    2016-01-01

    Plasma generator is a core component in an electrothermal-chemical (ETC) launcher. Its work state directly influences the launch efficiency of a system. The interaction between plasma and propellants is a very important mechanism in ETC technology. Based on the transient radiation model and open air plasma jet experiment, the mechanism of plasma ignition process is analyzed. Results show that the surface temperature of local solid propellant grain can quickly achieve the ignition temperature under the action of early transient plasma radiation. But it needs enough time to maintain the high energy flow to make self-sustained combustion of solid propellant grains. Because of the limited space characteristics of transient radiation, the near-field propellant grains can gain enough energy by the strong transient radiation to be ignited and achieve self-sustained combustion. The far-field propellant grains mainly gain the energy by the activated particles in plasma jet to be ignited and self-sustained combustion. Experiments show that plasma jet always has a high flow velocity in the area of the cartridge. Compared with conventional ignition, the solid propellant grains can obtain more quick and uniform ignition and self-sustained combustion by this kind of ablation controlled arc (ACA) plasma via energy skin effect of propellant grains, pre-heat temperature mechanism and high efficient jet diffusion.

  4. Decomposition of Chemical Chain Molecules with Atmospheric Pressure Plasma

    Science.gov (United States)

    Tansli, Murat; Tasal, Erol

    2016-10-01

    Chemical chain molecules' decomposition is an interesting subject area for the atmospheric pressure plasma applications. The effects of the atmospheric pressure argon plasma on 4-((2-methoxyphenyl)Diazenyl)Benzene-1,3,-Diol molecule at room temperature are investigated. This molecule is one of the industrial dye molecules used widely. When considering the ecological life, this molecule will be very harmful and danger. We suggest a different, easy and useful decomposing method for such molecules. Atmospheric pressure plasma jet was principally treated for this decomposing of the molecule. Fourier transform infrared spectrometry (FT-IR) was used to characterization of the molecule after the plasma application to molecule in liquid phase with ethanol and methanol solvents. The atmospheric-pressure plasma jet of argon (Ar) as non-equilibrium has been formed by ac-power generator with frequency - 24 kHz and voltage - 12 kV. Characterizations for solutions prepared with ethanol and methanol solvents of molecule have been examined after applying (duration: 3 minutes) the atmospheric pressure plasma jet. The molecule was broken at 6C-7N =8N-9C stretching peak after the plasma treatment. The new plasma photo-products for ethanol and methanol solutions were produced as 6C-7N-8N =9C (strong, varying) and 12C =17O (strong, wide) stretching peaks.

  5. Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

    Science.gov (United States)

    Vadym, Prysiazhnyi; Pavel, Slavicek; Eliska, Mikmekova; Milos, Klima

    2016-04-01

    This paper is aimed to show the influence of initial chemical pretreatment prior to subsequent plasma activation of aluminum surfaces. The results of our study showed that the state of the topmost surface layer (i.e. the surface morphology and chemical groups) of plasma modified aluminum significantly depends on the chemical precleaning. Commonly used chemicals (isopropanol, trichlorethane, solution of NaOH in deionized water) were used as precleaning agents. The plasma treatments were done using a radio frequency driven atmospheric pressure plasma pencil developed at Masaryk University, which operates in Ar, Ar/O2 gas mixtures. The effectiveness of the plasma treatment was estimated by the wettability measurements, showing high wettability improvement already after 0.3 s treatment. The effects of surface cleaning (hydrocarbon removal), surface oxidation and activation (generation of OH groups) were estimated using infrared spectroscopy. The changes in the surface morphology were measured using scanning electron microscopy. Optical emission spectroscopy measurements in the near-to-surface region with temperature calculations showed that plasma itself depends on the sample precleaning procedure.

  6. Inactivation of virus in solution by cold atmospheric pressure plasma: identification of chemical inactivation pathways

    Science.gov (United States)

    Aboubakr, Hamada A.; Gangal, Urvashi; Youssef, Mohammed M.; Goyal, Sagar M.; Bruggeman, Peter J.

    2016-05-01

    Cold atmospheric pressure plasma (CAP) inactivates bacteria and virus through in situ production of reactive oxygen and nitrogen species (RONS). While the bactericidal and virucidal efficiency of plasmas is well established, there is limited knowledge about the chemistry leading to the pathogen inactivation. This article describes a chemical analysis of the CAP reactive chemistry involved in the inactivation of feline calicivirus. We used a remote radio frequency CAP produced in varying gas mixtures leading to different plasma-induced chemistries. A study of the effects of selected scavengers complemented with positive control measurements of relevant RONS reveal two distinctive pathways based on singlet oxygen and peroxynitrous acid. The first mechanism is favored in the presence of oxygen and the second in the presence of air when a significant pH reduction is induced in the solution by the plasma. Additionally, smaller effects of the H2O2, O3 and \\text{NO}2- produced were also found. Identification of singlet oxygen-mediated 2-imidazolone/2-oxo-His (His  +14 Da)—an oxidative modification of His 262 comprising the capsid protein of feline calicivirus links the plasma induced singlet oxygen chemistry to viral inactivation.

  7. Remote operation of the GOLEM tokamak with hydrogen and helium plasmas

    Science.gov (United States)

    Svoboda, V.; Dvornova, A.; Dejarnac, R.; Prochazka, M.; Zaprianov, S.; Akhmethanov, R.; Bogdanova, M.; Dimitrova, M.; Dimitrov, Zh; Grover, O.; Hlavata, L.; Ivanov, K.; Kruglov, K.; Marinova, P.; Masherov, P.; Mogulkin, A.; Mlynar, J.; Stockel, J.; Volynets, A.

    2016-10-01

    The GOLEM tokamak was operated remotely via Internet connection during the 6th International Workshop and Summer School on Plasma Physics. Performances of hydrogen and helium discharges are compared in this paper. It is found, at similar vacuum conditions, that helium discharges are shorter but the breakdown of the working gas can be quite easily achieved at almost the same loop voltage. The plasma current in helium discharges is slightly lower than in the case of hydrogen. Turbulent fluctuations of the floating potential measured by means of an array of Langmuir probes reveal a noticeably different character in the two discharges.

  8. PTFE treatment by remote atmospheric Ar/O2 plasmas: a simple reaction scheme model proposal

    CERN Document Server

    Carbone, E A D; Keuning, W; van der Mullen, J J A M

    2013-01-01

    Polytetrafluoroethylene (PTFE) samples were treated by a remote atmospheric pressure microwave plasma torch and analyzed by water contact angle (WCA) and X-ray photoelectron spectroscopy (XPS). In the case of pure argon plasma a decrease of WCA is observed meanwhile an increase of hydrophobicity was observed when some oxygen was added to the discharge. The WCA results are correlated to XPS of reference samples and the change of WCA are attributed to changes in roughness of the samples. A simple kinetics scheme for the chemistry on the PTFE surface is proposed to explain the results.

  9. TELEMATICS APPLICATIONS REMOT: Interfaces and Adaptations of the Plasma Physics Demonstrator

    OpenAIRE

    Kemmerling, G.; Van der Meer, E.

    1997-01-01

    In document D6.2, a textual description of the soft- and hardware components of the plasma physics demonstrator as well as a definition of remote and local site was given. In order to couple these components to a complete teleoperation system, interfaces between them have to be defined and existing soft- and hardware have to be adapted. This task will be described in this document.

  10. Chemical reaction and dust formation studies in laboratory hydrocarbon plasmas.

    Science.gov (United States)

    Hippler, Rainer; Majumdar, Abhijit; Thejaswini, H. C.

    Plasma chemical reaction studies with relevance to, e.g., Titan's atmosphere have been per-formed in various laboratory plasmas [1,2]. Chemical reactions in a dielectric barrier discharge at medium pressure of 250-300 mbar have been studied in CH4 /N2 and CH4 /Ar gas mixtures by means of mass spectrometry. The main reaction scheme is production of H2 by fragmenta-tion of CH4 , but also production of larger hydrocarbons like Cn Hm with n up to 10 including formation of different functional CN groups is observed. [1] A. Majumdar and R. Hippler, Development of dielectric barrier discharge plasma processing apparatus for mass spectrometry and thin film deposition, Rev. Sci. Instrum. 78, 075103 (2007) [2] H.T. Do, G. Thieme, M. Frühlich, H. Kersten, and R. Hippler, Ion Molecule and Dust Particle Formation in Ar/CH4 , Ar/C2 H2 and Ar/C3 H6 Radio-frequency Plasmas, Contrib. Plasma Phys. 45, No. 5-6, 378-384 (2005)

  11. Transport and chemical loss rates in Saturn's inner plasma disk

    Science.gov (United States)

    Holmberg, M. K. G.; Wahlund, J.-E.; Vigren, E.; Cassidy, T. A.; Andrews, D. J.

    2016-03-01

    The Kronian moon Enceladus is constantly feeding its surrounding with new gas and dust, from cryovolcanoes located in its south polar region. Through photoionization and impact ionization of these neutrals, a plasma disk is created, which mainly contains hydrogen ions and water group ions. This paper investigates the importance of ion loss by outward radial transport and ion loss by dissociative recombination, which is the dominant chemical loss process in the inner plasma disk. We use plasma densities derived from several years of measurements by the Cassini Radio and Plasma Wave Science electric field power spectral density and Langmuir probe to calculate the total flux tube content NL2. Our calculation shows that NL2 agrees well with earlier estimates within dipole L shell 8. We also show that loss by transport dominates chemical loss between L shells 4 and 10. Using extrapolation of available measurements, we extend the study to include L shells 2.5 to 4. The results indicate that loss by transport dominates chemical loss also between L shells 2.5 and 4. The loss rate by transport is around five times larger at L shell 5, and the difference increases as L7.7 beyond L = 5, for the net ion population. Chemical loss may still be important for the structure of the plasma disk in the region closest to Enceladus (around ±0.5 RS) at 3.95 RS (1 RS = Saturn's equatorial radius = 60,268 km), since the transport and chemical loss rates only differ by a factor of ˜2 in this region. We also derive the total plasma content of the plasma disk between L shells 4 and 10 to be 1.9 × 1033 ions and the total ion source rate for the same region to be 5.8 × 1027 s-1. The estimated equatorial ion production rate P ranges from 2.6 × 10-5 cm-3 s-1 (at L = 10) to 1.1 × 10-4 cm-3 s-1 (at L = 4.8). The net mass loading rate is derived to be 123 kg/s for L shells 4 to 10.

  12. Investigation of opening switch mechanisms based on chemically reactive plasmas

    Science.gov (United States)

    Lapatovich, W. P.; Piejak, R. B.; Proud, J. M.

    1985-11-01

    An investigation of discharge-induced chemical reactions resulting in high-density product vapors containing strongly attaching gases has been conducted to evaluate the feasibility and potential of such reactions in rapid opening plasma switches. This new concept of employing such reactions to limit and/or interrupt large currents on a microsecond time scale was studied in two element (electrodeless and electroded) devices and in three element (electroded) devices. Bimolecular and unimolecular reactions were considered. The plasma reaction between AlCl sub 3 and SiO sub 2 was studied. The electrical properties of one of the reaction products (SiCl sub 4) is reported.

  13. Numerical simulation of chemical processes in atmospheric plasmas

    Institute of Scientific and Technical Information of China (English)

    Ouyang Jian-Ming; Guo Wei; Wang Long; Shao Fu-Qiu

    2004-01-01

    A model is built to study chemical processes in atmospheric plasmas at low altitude (high pressure) and at high altitude (low pressure). The plasma lifetime and the temporal evolution of the main charged species are presented.The electron number density does not strictly obey the exponential damping law in a long period. The heavy charged species are dominant at low altitude in comparison with the light species at high altitude. Some species of small amount in natural air play an important role in the processes.

  14. Dielectric properties in microwave remote plasma sustained in argon: Expanding plasma conditions

    Energy Technology Data Exchange (ETDEWEB)

    Jauberteau, J. L.; Jauberteau, I. [UMR 7315 CNRS, SPCTS, 12 rue Atlantis, 87068 Limoges (France)

    2012-11-15

    This work is devoted to the study of the relative permittivity in argon expanding plasma produced below a microwave discharge sustained in a quartz tube and working at 2.45 GHz. We discuss results and explain the microwave propagation within the reactor, outside the quartz tube. It is shown that at low pressures (133 Pa) and at powers ranging from 100 W to 400 W, the wave frequency remains lower than the plasma frequency anywhere in the expanding plasma. Under these conditions, the real part of the relative permittivity is negative and the wave is reflected. Surprisingly, in these conditions, the plasma is produced inside and outside the quartz tube, below the wave launcher. This effect can be explained considering a surface wave propagating at the surface of the quartz tube then into the reactor, on the external surface of the expanding plasma below the quartz tube.

  15. Hydrogen desorption from hydrogen fluoride and remote hydrogen plasma cleaned silicon carbide (0001) surfaces

    Energy Technology Data Exchange (ETDEWEB)

    King, Sean W., E-mail: sean.king@intel.com; Tanaka, Satoru; Davis, Robert F. [Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States); Nemanich, Robert J. [Department of Physics, North Carolina State University, Raleigh, North Carolina 27695 (United States)

    2015-09-15

    Due to the extreme chemical inertness of silicon carbide (SiC), in-situ thermal desorption is commonly utilized as a means to remove surface contamination prior to initiating critical semiconductor processing steps such as epitaxy, gate dielectric formation, and contact metallization. In-situ thermal desorption and silicon sublimation has also recently become a popular method for epitaxial growth of mono and few layer graphene. Accordingly, numerous thermal desorption experiments of various processed silicon carbide surfaces have been performed, but have ignored the presence of hydrogen, which is ubiquitous throughout semiconductor processing. In this regard, the authors have performed a combined temperature programmed desorption (TPD) and x-ray photoelectron spectroscopy (XPS) investigation of the desorption of molecular hydrogen (H{sub 2}) and various other oxygen, carbon, and fluorine related species from ex-situ aqueous hydrogen fluoride (HF) and in-situ remote hydrogen plasma cleaned 6H-SiC (0001) surfaces. Using XPS, the authors observed that temperatures on the order of 700–1000 °C are needed to fully desorb C-H, C-O and Si-O species from these surfaces. However, using TPD, the authors observed H{sub 2} desorption at both lower temperatures (200–550 °C) as well as higher temperatures (>700 °C). The low temperature H{sub 2} desorption was deconvoluted into multiple desorption states that, based on similarities to H{sub 2} desorption from Si (111), were attributed to silicon mono, di, and trihydride surface species as well as hydrogen trapped by subsurface defects, steps, or dopants. The higher temperature H{sub 2} desorption was similarly attributed to H{sub 2} evolved from surface O-H groups at ∼750 °C as well as the liberation of H{sub 2} during Si-O desorption at temperatures >800 °C. These results indicate that while ex-situ aqueous HF processed 6H-SiC (0001) surfaces annealed at <700 °C remain terminated by some surface C–O and

  16. A study of increasing radical density and etch rate using remote plasma generator system

    Science.gov (United States)

    Lee, Jaewon; Kim, Kyunghyun; Cho, Sung-Won; Chung, Chin-Wook

    2013-09-01

    To improve radical density without changing electron temperature, remote plasma generator (RPG) is applied. Multistep dissociation of the polyatomic molecule was performed using RPG system. RPG is installed to inductively coupled type processing reactor; electrons, positive ions, radicals and polyatomic molecule generated in RPG and they diffused to processing reactor. The processing reactor dissociates the polyatomic molecules with inductively coupled power. The polyatomic molecules are dissociated by the processing reactor that is operated by inductively coupled power. Therefore, the multistep dissociation system generates more radicals than single-step system. The RPG was composed with two cylinder type inductively coupled plasma (ICP) using 400 kHz RF power and nitrogen gas. The processing reactor composed with two turn antenna with 13.56 MHz RF power. Plasma density, electron temperature and radical density were measured with electrical probe and optical methods.

  17. Inactivation of Escherichia Coli Using Remote Low Temperature Glow Discharge Plasma

    Institute of Scientific and Technical Information of China (English)

    HU Miao; CHEN Jierong; CHEN Chua

    2008-01-01

    Low-temperature plasma is distinguished as a developing approach for sterilization which can deal with and overcome those problems such as thermal sensitivity and destruction by heat,formation of toxic by-products,higher costs and inefficiency in performances,caused by conventional methods.In this study,an experimental investigation was undertaken to characterize the effects of the operational parameters,such as treating time,discharge power and gas flow rate,of remote glow discharge air plasma.The results show that the inactivation of Escherichia coli can reach above 99.99% in less than 60 seconds and the optimal operational conditions for treating time,discharge power and gas flow rate were:40 s,80 W and 60 cm3/min,respectively.The contribution of UV radiation during plasma germ deactivation is very limited.

  18. Review: Plasma-enhanced chemical vapor deposition of nanocrystalline diamond

    Directory of Open Access Journals (Sweden)

    Katsuyuki Okada

    2007-01-01

    Full Text Available Nanocrystalline diamond films have attracted considerable attention because they have a low coefficient of friction and a low electron emission threshold voltage. In this paper, the author reviews the plasma-enhanced chemical vapor deposition (PE-CVD of nanocrystalline diamond and mainly focuses on the growth of nanocrystalline diamond by low-pressure PE-CVD. Nanocrystalline diamond particles of 200–700 nm diameter have been prepared in a 13.56 MHz low-pressure inductively coupled CH4/CO/H2 plasma. The bonding state of carbon atoms was investigated by ultraviolet-excited Raman spectroscopy. Electron energy loss spectroscopy identified sp2-bonded carbons around the 20–50 nm subgrains of nanocrystalline diamond particles. Plasma diagnostics using a Langmuir probe and the comparison with plasma simulation are also reviewed. The electron energy distribution functions are discussed by considering different inelastic interaction channels between electrons and heavy particles in a molecular CH4/H2 plasma.

  19. Chemical characterisation of total suspended particulate matter from a remote area in Amazonia

    Science.gov (United States)

    Gonçalves, Cátia; Figueiredo, Bernardino R.; Alves, Célia A.; Cardoso, Arnaldo A.; da Silva, Rodrigo; Kanzawa, Simone H.; Vicente, Ana Margarida

    2016-12-01

    This research had as study object the total suspended particulate matter collected in the Alenquer region, a remote area in the Pará state. The main objectives were the characterisation of the inorganic and organic chemical composition of the aerosol, looking for seasonal patterns and the identification of probable emission sources and formation processes. A set of 30 samples were collected in the rainy (April-May) and dry season (August-September) of 2014. The analytical methods included gravimetric analysis, water-soluble ions analysis by ion chromatography (IC), elemental analysis by inductively coupled plasma mass spectrometry (ICP-MS) equipped with collision cell technology, carbonaceous content determination with a thermal-optical system and organic speciation by gas chromatography-mass spectrometry (GC-MS). The average concentrations of particulate matter ranged from 14 ± 1.3 μg·m- 3 to 31 ± 7.8 μg·m- 3, in the rainy and dry season, respectively. The carbonaceous content represented, on average, approximately 27% and 21% of the particulate matter in the rainy and dry season, respectively. Na+, Cl-, SO₄2 -, and NO₃- yield the highest concentrations in both seasons. Na was the dominant element, reflecting the transport of air masses from the Atlantic. An increase in concentrations between the rainy and dry seasons was especially noted for the terrigenous elements such Mn, Fe and Al. The chromatographically resolved organics included n-alkanes, n-alkenes, PAHs, n-alkanoic acids, n-di-acids, resin acids and some phenolic compounds. The primary inputs of organic constituents to the aerosols of Alenquer based on the homologous compound series and biomarkers were: (i) natural emissions from terrestrial higher plants waxes, particularly in dry season; (ii) anthropogenic emissions from diesel fuel combustion and biomass combustion, predominating during the dry season. The chemical characterisation along with the backward trajectory cluster analysis

  20. Diagnostic for Plasma Enhanced Chemical Vapor Deposition and Etch Systems

    Science.gov (United States)

    Cappelli, Mark A.

    1999-01-01

    In order to meet NASA's requirements for the rapid development and validation of future generation electronic devices as well as associated materials and processes, enabling technologies ion the processing of semiconductor materials arising from understanding etch chemistries are being developed through a research collaboration between Stanford University and NASA-Ames Research Center, Although a great deal of laboratory-scale research has been performed on many of materials processing plasmas, little is known about the gas-phase and surface chemical reactions that are critical in many etch and deposition processes, and how these reactions are influenced by the variation in operating conditions. In addition, many plasma-based processes suffer from stability and reliability problems leading to a compromise in performance and a potentially increased cost for the semiconductor manufacturing industry. Such a lack of understanding has hindered the development of process models that can aid in the scaling and improvement of plasma etch and deposition systems. The research described involves the study of plasmas used in semiconductor processes. An inductively coupled plasma (ICP) source in place of the standard upper electrode assembly of the Gaseous Electronics Conference (GEC) radio-frequency (RF) Reference Cell is used to investigate the discharge characteristics and chemistries. This ICP source generates plasmas with higher electron densities (approximately 10(exp 12)/cu cm) and lower operating pressures (approximately 7 mTorr) than obtainable with the original parallel-plate version of the GEC Cell. This expanded operating regime is more relevant to new generations of industrial plasma systems being used by the microelectronics industry. The motivation for this study is to develop an understanding of the physical phenomena involved in plasma processing and to measure much needed fundamental parameters, such as gas-phase and surface reaction rates. species

  1. Raman backscatter as a remote laser power sensor in high-energy-density plasmas

    CERN Document Server

    Moody, J D; Divol, L; Michel, P; Robey, H F; LePape, S; Ralph, J; Ross, J S; Glenzer, S H; Kirkwood, R K; Landen, O L; MacGowan, B J; Nikroo, A; Williams, E A

    2013-01-01

    Stimulated Raman backscatter (SRS) is used as a remote sensor to quantify the instantaneous laser power after transfer from outer to inner cones that cross in a National Ignition Facility (NIF) gas-filled hohlraum plasma. By matching SRS between a shot reducing outer vs a shot reducing inner power we infer that ~half of the incident outer-cone power is transferred to inner cones, for the specific time and wavelength configuration studied. This is the first instantaneous non-disruptive measure of power transfer in an indirect drive NIF experiment using optical measurements.

  2. Low temperature metal free growth of graphene on insulating substrates by plasma assisted chemical vapor deposition

    Science.gov (United States)

    Muñoz, R.; Munuera, C.; Martínez, J. I.; Azpeitia, J.; Gómez-Aleixandre, C.; García-Hernández, M.

    2017-03-01

    Direct growth of graphene films on dielectric substrates (quartz and silica) is reported, by means of remote electron cyclotron resonance plasma assisted chemical vapor deposition r-(ECR-CVD) at low temperature (650 °C). Using a two step deposition process- nucleation and growth- by changing the partial pressure of the gas precursors at constant temperature, mostly monolayer continuous films, with grain sizes up to 500 nm are grown, exhibiting transmittance larger than 92% and sheet resistance as low as 900 Ω sq-1. The grain size and nucleation density of the resulting graphene sheets can be controlled varying the deposition time and pressure. In additon, first-principles DFT-based calculations have been carried out in order to rationalize the oxygen reduction in the quartz surface experimentally observed. This method is easily scalable and avoids damaging and expensive transfer steps of graphene films, improving compatibility with current fabrication technologies.

  3. Destruction of Hazardous Industrial Chemicals Using an Arcjet Plasma Torch*

    Science.gov (United States)

    Fleddermann, C. B.; Snyder, H. R.; Gahl, J. M.

    1996-10-01

    A small-scale thermal plasma torch has been used for the disposal of hazardous industrial chemicals including alcohols, ketones, and chlorinated hydrocarbons. The plasma jet is operated at currents up to 200 Amperes and waste flow rates up to 600 ml/hr. Argon is used as the plasma gas with oxygen added to the reactor to alter the reaction chemistry. Destruction of the waste and by-product formation are monitored using a residual gas analyzer, and the temperature of the plasma plume is measured using an enthalpy probe. The by-products of the destruction of acetone are primarily carbon dioxide, carbon monoxide, and small amounts of hydrocarbons. Adding oxygen to the reactor increases the production of carbon dioxide and significantly decreases the amount of acetone in the exhaust gases. This reactor has achieved greater than 99 percent destruction efficiency for acetone when oxygen is added to the reaction mixture at an arcjet current of 75 Amperes, with similar destruction efficiencies observed for ethanol and trichloroethylene. *Supported by the U.S. DOE through the WERC program administered by New Mexico State University.

  4. Extraction characteristics of a low-energy ion beam system with a remote plasma chamber

    Energy Technology Data Exchange (ETDEWEB)

    Vasquez, M. R., E-mail: mrvasquez@coe.upd.edu.ph [Department of Mining, Metallurgical, and Materials Engineering, College of Engineering, University of the Philippines, Diliman, Quezon City 1101 (Philippines); Wada, M. [Graduate School of Science and Engineering, Doshisha University, Kyotanabe, Kyoto 610-0321 (Japan)

    2016-02-15

    Low-energy argon beams were extracted from a dual-chamber ion source system. The first chamber is a quartz cylinder where dense inductively coupled plasmas were produced using 13.56 MHz radio frequency (rf) power. The discharge was driven into an adjacent chamber which acts as a reservoir for ion beam extraction using a dual-electrode extractor configuration. Extraction of ions from the second chamber with energies in the 100 eV range was achieved while minimizing fluctuations induced by the rf signal. A custom-built retarding potential analyzer was used to analyze the effectiveness of ion beam transport using the remote plasma chamber. Well-defined beams were extracted between 60 and 100 V extraction potentials at 50–100 W rf powers. An increase in rf power resulted in an increase in average ion energy, increase in ion current density while the energy spread remains constant.

  5. Plasma Enhanced Chemical Vapour Deposition of Horizontally Aligned Carbon Nanotubes

    Directory of Open Access Journals (Sweden)

    Matthew T. Cole

    2013-05-01

    Full Text Available A plasma-enhanced chemical vapour deposition reactor has been developed to synthesis horizontally aligned carbon nanotubes. The width of the aligning sheath was modelled based on a collisionless, quasi-neutral, Child’s law ion sheath where these estimates were empirically validated by direct Langmuir probe measurements, thereby confirming the proposed reactors ability to extend the existing sheath fields by up to 7 mm. A 7 mbar growth atmosphere combined with a 25 W plasma permitted the concurrent growth and alignment of carbon nanotubes with electric fields of the order of 0.04 V μm−1 with linear packing densities of up to ~5 × 104 cm−1. These results open up the potential for multi-directional in situ alignment of carbon nanotubes providing one viable route to the fabrication of many novel optoelectronic devices.

  6. Analytical model of plasma-chemical etching in planar reactor

    Science.gov (United States)

    Veselov, D. S.; Bakun, A. D.; Voronov, Yu A.; Kireev, V. Yu; Vasileva, O. V.

    2016-09-01

    The paper discusses an analytical model of plasma-chemical etching in planar diode- type reactor. Analytical expressions of etch rate and etch anisotropy were obtained. It is shown that etch anisotropy increases with increasing the ion current and ion energy. At the same time, etch selectivity of processed material decreases as compared with the mask. Etch rate decreases with the distance from the centre axis of the reactor. To decrease the loading effect, it is necessary to reduce the wafer temperature and pressure in the reactor, as well as increase the gas flow rate through the reactor.

  7. Plasma environment during hot cathode direct current discharge plasma chemical vapor deposition of diamond films

    Institute of Scientific and Technical Information of China (English)

    朱晓东; 詹如娟; 周海洋; 胡敏; 温晓辉; 周贵恩; 李凡庆

    1999-01-01

    The plasma characteristics have been investigated in situ by using optical emission spectroscopy (OES) and the Langmuir probe during hot cathode direct current discharge plasma chemical vapor deposition of diamond films. The changes of atomic H and CH radical in the ground state have been calculated quantitatively according to the results of OES and the Langmuir probe measurement as discharge current density varied. It is shown that atomic H and CH radicals both in the ground state and in the excited state increase with the enhancement of the discharge current density in the plasma. The electron density and CH emission intensity increase linearly with the enhancement of discharge current densities. The generation of different carbon-containing radicals is related to the elevation of electron temperature. Combining the growth process of diamond films and the diagnostic results, it is shown that atomic H in the excited state may improve the diamond growth efficiently, and the increase of electron temperat

  8. Remote sensing of inner heliospheric plasmas. Annual report, 15 November 1991-14 November 1992

    Energy Technology Data Exchange (ETDEWEB)

    Jackson, B.V.

    1992-12-15

    Solar disturbances produce major effects on the corona, the solar wind, the interplanetary medium, and the Earth along with its magnetosphere. We have developed new techniques for studying plasma disturbances in the inner heliosphere by remotely sensing them. These techniques use data from the HELIOS spacecraft zodiacal light photometers, the ISEE-3 spacecraft kilometer radio-wave experiment, and a variety of other spacecraft and ground-based instruments. New in this study is our use of interplanetary scintillation (IPS) data from the Cambridge, England radio telescope. The zodiacal-light photometers on board the two HELIOS spacecraft (data coverage from 1974 to 1986) provide the first good information about the heliospheric masses and shapes of propagating disturbances. Metric and kilometric type II and type III radiation caused by shock waves and fast moving electrons respectively are another way to remotely sense the structures which propagate outward from the Sun. The best kilometric radio-wave sensing of inner heliospheric plasma is available from the ISEE-3 spacecraft, and recently we have been able to use these data to obtain crude images of the Earth's magnetosphere. The investigations into the physics of the disturbances sensed by these techniques and the ability to forecast them are underway.... Helios photometer data, Type III radio bursts, ISEE-3, Kilometric data.

  9. Mathematical simulation of plasma-chemical coal conversion

    Energy Technology Data Exchange (ETDEWEB)

    Messerle, A.V. [Bauman State Technical University, Moscow (Russian Federation)

    2004-02-01

    A mathematical model that describes the conversion of a coal-dust flow in a cylindrical plasma reactor is presented. The model describes a two-phase (coal particles + air) chemically reacting flow, which propagates in a channel with or without an internal heat source (an electric arc, a plasmatron torch, or exothermic chemical reactions). The model is based on the assumption that the process is quasi-stationary and one-dimensional; coal particles are taken as isothermal, and ash is assumed to be an inert component. The model represents the composition of coals by their organic and mineral constituents. The model was implemented as a pro-ram for personal computers; calculations performed with the use of this program are in satisfactory agreement with experimental data.

  10. Tungsten Deposition on Graphite using Plasma Enhanced Chemical Vapour Deposition.

    Science.gov (United States)

    Sharma, Uttam; Chauhan, Sachin S.; Sharma, Jayshree; Sanyasi, A. K.; Ghosh, J.; Choudhary, K. K.; Ghosh, S. K.

    2016-10-01

    The tokamak concept is the frontrunner for achieving controlled thermonuclear reaction on earth, an environment friendly way to solve future energy crisis. Although much progress has been made in controlling the heated fusion plasmas (temperature ∼ 150 million degrees) in tokamaks, technological issues related to plasma wall interaction topic still need focused attention. In future, reactor grade tokamak operational scenarios, the reactor wall and target plates are expected to experience a heat load of 10 MW/m2 and even more during the unfortunate events of ELM's and disruptions. Tungsten remains a suitable choice for the wall and target plates. It can withstand high temperatures, its ductile to brittle temperature is fairly low and it has low sputtering yield and low fuel retention capabilities. However, it is difficult to machine tungsten and hence usages of tungsten coated surfaces are mostly desirable. To produce tungsten coated graphite tiles for the above-mentioned purpose, a coating reactor has been designed, developed and made operational at the SVITS, Indore. Tungsten coating on graphite has been attempted and successfully carried out by using radio frequency induced plasma enhanced chemical vapour deposition (rf -PECVD) for the first time in India. Tungsten hexa-fluoride has been used as a pre-cursor gas. Energy Dispersive X-ray spectroscopy (EDS) clearly showed the presence of tungsten coating on the graphite samples. This paper presents the details of successful operation and achievement of tungsten coating in the reactor at SVITS.

  11. Remote Detection of Biological Particles and Chemical Plumes Using UV Fluorescence Lidar

    Science.gov (United States)

    Tiee, J. J.; Hof, D. E.; Karl, R. R.; Martinez, R. J.; Quick, C. R.; Cooper, D. I.; Eichinger, W. E.; Holtkamp, D. B.

    1992-01-01

    A lidar system based on ultraviolet (UV) laser induced fluorescence (LIF) was developed for the remote detection of atmospherically dispersed biological particles and chemical vapors. This UV fluorescence lidar has many potential applications for monitoring environmental pollution, industrial waste emission, agricultural insect control, illicit chemical processing, and military defense operations. The general goal of this work is to investigate the research issues associated with the long range detection and identification of chemicals, e.g. aromatic solvents and chemical precursors, and biological materials, e.g. bacillus thuringiensis (BT) and bacillus globiggi (BG). In the detection of biological particulates, we are particularly interested in extending the detection range of an existing solar-blind 248-nm lidar system. We are investigating the use of longer excitation laser wavelengths (i.e. lambda greater than 280-nm to have more favorable atmospheric light transmission characteristics) for improving detection range to better than 10 km. In the detection of chemical plumes, our main research objectives are to determine how accurately and sensitively a chemical plume can be located at range, and how well spectrally the chemical species can be measured to allow their identification.

  12. Chemical and Physical Properties of the Remote Marine Aerosol by Gravimetric and Electron Microscopic Methods.

    Science.gov (United States)

    McInnes, Lynn Mari

    The chemical and physical properties of the individual submicrometer particles in the remote marine boundary layer (MBL) atmosphere are important parameters used to study atmospheric processes. Particles in this size range influence the total number concentration of particles, the number concentration of cloud condensation nuclei, and the total light scattering. As the aerosol evolves by physical and chemical mechanisms, the aerosol properties will also change. It is therefore important to measure the changing aerosol properties as a function of individual particle size within the meteorologically important time periods. Individual particle analysis using electron microscopy (EM) techniques coupled with X ray analysis can provide chemical, morphological, and particle size information on samples collected for only a few minutes. It is also possible to determine the ambient particle size distribution and relative abundances from the EM analysis using correction techniques. Measurements obtained from aerosol particles collected from the remote (MBL) during the Pacific Sulfur Stratus Investigation (PSI-3) and Cloud and Aerosol Chemistry Experiment (CACHE-1) at Cheeka Peak in the spring of 1991 and 1993 are presented along with results obtained from aerosol particles collected during the Marine Aerosol and Gas Exchange (MAGE) Experiment in the Equatorial Pacific and Radiatively Important Trace Species (RITS) Experiment in the spring of 1992 and 1993. Measurements of relative abundance of sea-salt, sulfate, and carbon-containing particles are presented as well as their chemistry. In particular the chemical reactions involving sea-salt particles are discussed in relation to the measurements of chloride depletion and sulfur enriched reported for individual particles. To supplement the few available measurements of the total submicrometer aerosol mass, samples were also collected for gravimetric analysis. Comparisons of the gravimetric mass to the total aerosol mass

  13. The Plasma Chemistry of Polymer Surfaces

    CERN Document Server

    Friedrich, Jö

    2012-01-01

    This book illustrates plasma properties, polymer characteristics, surface specifics, and how to purposefully combine plasma and polymer chemistry. In so doing, it covers plasma polymerization, surface functionalization, etching, crosslinking, and deposition of monotype functional-group-bearing plasma polymers. It explains different techniques and plasma types, such as pressure-pulsed, remote, low-wattage plasmas and plasma polymerization in liquids. Finally, among the numerous applications discussed are plasmas for chemical synthesis, industrial processes or the modification of membranes and p

  14. The Main Plasma Chemical Process of Nitric Oxide Production by Arc Discharge%The Main Plasma Chemical Process of Nitric Oxide Production by Arc Discharge

    Institute of Scientific and Technical Information of China (English)

    杨旗; 胡辉; 陈卫鹏; 许杰; 张锦丽; 吴双

    2011-01-01

    By adopting the optical multi-channel analyzer combined with fourier transform infrared (FTIR) spectrometer, the dominant free radicals and products generated by arc discharge were measured and studied, and the main plasma chemical reaction process in the nitric oxide production by arc discharge was identified. Plasma chemical kinetic curves of O, O2, N2, N and NO were simulated by using CHEMKIN and MATLAB. The results show that the main plasma chemical reaction process of nitric oxide production by arc discharge is a replacement reaction between O and N2, where NO can be generated instantaneously when discharging reaches stable.

  15. Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes

    Science.gov (United States)

    Chen, Zheng; Wang, Haoran; Wang, Xiao; Chen, Ping; Liu, Yunfei; Zhao, Hongyu; Zhao, Yi; Duan, Yu

    2017-01-01

    Encapsulation is essential to protect the air-sensitive components of organic light-emitting diodes (OLEDs) such as active layers and cathode electrodes. In this study, hybrid zirconium inorganic/organic nanolaminates were fabricated using remote plasma enhanced atomic layer deposition (PEALD) and molecular layer deposition at a low temperature. The nanolaminate serves as a thin-film encapsulation layer for OLEDs. The reaction mechanism of PEALD process was investigated using an in-situ quartz crystal microbalance (QCM) and in-situ quadrupole mass spectrometer (QMS). The bonds present in the films were determined by Fourier transform infrared spectroscopy. The primary reaction byproducts in PEALD, such as CO, CO2, NO, H2O, as well as the related fragments during the O2 plasma process were characterized using the QMS, indicating a combustion-like reaction process. The self-limiting nature and growth mechanisms of the ZrO2 during the complex surface chemical reaction of the ligand and O2 plasma were monitored using the QCM. The remote PEALD ZrO2/zircone nanolaminate structure prolonged the transmission path of water vapor and smooth surface morphology. Consequently, the water barrier properties were significantly improved (reaching 3.078 × 10‑5 g/m2/day). This study also shows that flexible OLEDs can be successfully encapsulated to achieve a significantly longer lifetime.

  16. Chemical Evolution of Strongly Interacting Quark-Gluon Plasma

    Directory of Open Access Journals (Sweden)

    Ying-Hua Pan

    2014-01-01

    Full Text Available At very initial stage of relativistic heavy ion collisions a wave of quark-gluon matter is produced from the break-up of the strong color electric field and then thermalizes at a short time scale (~1 fm/c. However, the quark-gluon plasma (QGP system is far out of chemical equilibrium, especially for the heavy quarks which are supposed to reach chemical equilibrium much late. In this paper a continuing quark production picture for strongly interacting QGP system is derived, using the quark number susceptibilities and the equation of state; both of them are from the results calculated by the Wuppertal-Budapest lattice QCD collaboration. We find that the densities of light quarks increase by 75% from the temperature T=400 MeV to T=150 MeV, while the density of strange quark annihilates by 18% in the temperature region. We also offer a discussion on how this late production of quarks affects the final charge-charge correlations.

  17. Chemical erosion of carbon at ITER relevant plasma fluxes: Results from the linear plasma generator Pilot-PSI

    NARCIS (Netherlands)

    van Rooij, G. J.; Westerhout, J.; Brezinsek, S.; Rapp, J.

    2011-01-01

    The chemical erosion of carbon was investigated in the linear plasma device Pilot-PSI for ITER divertor relevant hydrogen plasma flux densities 10(23) < Gamma < 10(25) m(-2) s(-1). The erosion was analyzed in situ by optical emission spectroscopy and post mortem by surface profilometry. The ex

  18. Remote-controlling chemical reactions by light: towards chemistry with high spatio-temporal resolution.

    Science.gov (United States)

    Göstl, Robert; Senf, Antti; Hecht, Stefan

    2014-03-21

    The foundation of the chemical enterprise has always been the creation of new molecular entities, such as pharmaceuticals or polymeric materials. Over the past decades, this continuing effort of designing compounds with improved properties has been complemented by a strong effort to render their preparation (more) sustainable by implementing atom as well as energy economic strategies. Therefore, synthetic chemistry is typically concerned with making specific bonds and connections in a highly selective and efficient manner. However, to increase the degree of sophistication and expand the scope of our work, we argue that the modern aspiring chemist should in addition be concerned with attaining (better) control over when and where chemical bonds are being made or broken. For this purpose, photoswitchable molecular systems, which allow for external modulation of chemical reactions by light, are being developed and in this review we are covering the current state of the art of this exciting new field. These "remote-controlled synthetic tools" provide a remarkable opportunity to perform chemical transformations with high spatial and temporal resolution and should therefore allow regulating biological processes as well as material and device performance.

  19. A mathematical model and simulation results of plasma enhanced chemical vapor deposition of silicon nitride films

    NARCIS (Netherlands)

    Konakov, S.A.; Krzhizhanovskaya, V.V.

    2015-01-01

    We developed a mathematical model of Plasma Enhanced Chemical Vapor Deposition (PECVD) of silicon nitride thin films from SiH4-NH3-N2-Ar mixture, an important application in modern materials science. Our multiphysics model describes gas dynamics, chemical physics, plasma physics and electrodynamics.

  20. Titanium nitride plasma-chemical synthesis with titanium tetrachloride raw material in the DC plasma-arc reactor

    Science.gov (United States)

    Kirpichev, D. E.; Sinaiskiy, M. A.; Samokhin, A. V.; Alexeev, N. V.

    2017-04-01

    The possibility of plasmochemical synthesis of titanium nitride is demonstrated in the paper. Results of the thermodynamic analysis of TiCl4 - H2 - N2 system are presented; key parameters of TiN synthesis process are calculated. The influence of parameters of plasma-chemical titanium nitride synthesis process in the reactor with an arc plasmatron on characteristics on the produced powders is experimentally investigated. Structure, chemical composition and morphology dependencies on plasma jet enthalpy, stoichiometric excess of hydrogen and nitrogen in a plasma jet are determined.

  1. Surface chemical changes of atmospheric pressure plasma treated rabbit fibres important for felting process

    Energy Technology Data Exchange (ETDEWEB)

    Štěpánová, Vlasta, E-mail: vstepanova@mail.muni.cz [Department of Physical Electronics, Faculty of Science Masaryk University, Kotlářská 2, 611 37 Brno (Czech Republic); Slavíček, Pavel; Stupavská, Monika; Jurmanová, Jana [Department of Physical Electronics, Faculty of Science Masaryk University, Kotlářská 2, 611 37 Brno (Czech Republic); Černák, Mirko [Department of Physical Electronics, Faculty of Science Masaryk University, Kotlářská 2, 611 37 Brno (Czech Republic); Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University, Mlynská dolina F2, 842 48 Bratislava (Slovakia)

    2015-11-15

    Graphical abstract: - Highlights: • Rabbit fibres plasma treatment is an effective method for fibres modification. • Atmospheric pressure plasma treatment is able to affect fibres properties. • Surface changes on fibres after plasma treatment were analysed via SEM, ATR-FTIR, XPS. • Significant increase of fibres wettability after plasma treatment was observed. • Plasma treatment at atmospheric pressure can replace the chemical treatment of fibres. - Abstract: We introduce the atmospheric pressure plasma treatment as a suitable procedure for in-line industrial application of rabbit fibres pre-treatment. Changes of rabbit fibre properties due to the plasma treatment were studied in order to develop new technology of plasma-based treatment before felting. Diffuse Coplanar Surface Barrier Discharge (DCSBD) in ambient air at atmospheric pressure was used for plasma treatment. Scanning electron microscopy was used for determination of the fibres morphology before and after plasma treatment. X-ray photoelectron spectroscopy and attenuated total reflectance-Fourier transform infrared spectroscopy were used for evaluation of reactive groups. The concentration of carbon decreased and conversely the concentration of nitrogen and oxygen increased after plasma treatment. Aging effect of plasma treated fibres was also investigated. Using Washburn method the significant increase of fibres wettability was observed after plasma treatment. New approach of pre-treatment of fibres before felting using plasma was developed. Plasma treatment of fibres at atmospheric pressure can replace the chemical method which consists of application of strong acids on fibres.

  2. Grafting of copolymer styrene maleic anhydride on poly(ethylene terephthalate) film by chemical reaction and by plasma method

    Energy Technology Data Exchange (ETDEWEB)

    Bigan, Muriel; Bigot, Julien [Laboratoire de Chimie Organique et Macromoleculaire (UMR 8009), Universite des Sciences et Technologies de Lille, 59655 Villeneuve d' Ascq Cedex (France); Mutel, Brigitte [Laboratoire de Genie des Procedes d' Interactions Fluides reactifs-Materiaux (UPRES-EA 3751), Batiment C5, Universite des Sciences et Technologies de Lille, 59655 Villeneuve d' Ascq Cedex (France)], E-mail: Brigitte.mutel@univ-lille1.fr; Coqueret, Xavier [Laboratoire Reactions Selectives et Applications (UMR-CNRS 6519) Universite de Reims Champagne-Ardennes, B.P. 1039, 51687 Reims Cedex 2 (France)

    2008-02-15

    This work deals with the chemical grafting of a styrene maleic anhydride copolymer on the surface of a previously hydrolyzed polyethylene terephthalate (PET) film 12 {mu}m thick via covalent bond. Two different ways are studied. The first one involves an activation of the hydrolyzed PET by the triethylamine before the grafting step. In the second one, the copolymer reacts with the 4-dimethylaminopyridine in order to form maleinyl pyridinium salt which reacts with alcohol function of the hydrolyzed PET. Characterization and quantification of the grafting are performed by Fourier transform infrared spectroscopy. Factorial experiment designs are used to optimize the process and to estimate experimental parameters effects. The opportunity to associate the chemical process to a cold remote nitrogen plasma one is also examined.

  3. Combustion flame-plasma hybrid reactor systems, and chemical reactant sources

    Science.gov (United States)

    Kong, Peter C

    2013-11-26

    Combustion flame-plasma hybrid reactor systems, chemical reactant sources, and related methods are disclosed. In one embodiment, a combustion flame-plasma hybrid reactor system comprising a reaction chamber, a combustion torch positioned to direct a flame into the reaction chamber, and one or more reactant feed assemblies configured to electrically energize at least one electrically conductive solid reactant structure to form a plasma and feed each electrically conductive solid reactant structure into the plasma to form at least one product is disclosed. In an additional embodiment, a chemical reactant source for a combustion flame-plasma hybrid reactor comprising an elongated electrically conductive reactant structure consisting essentially of at least one chemical reactant is disclosed. In further embodiments, methods of forming a chemical reactant source and methods of chemically converting at least one reactant into at least one product are disclosed.

  4. Intermediate mass dilepton production during the chemical equilibration of quark gluon plasma

    Institute of Scientific and Technical Information of China (English)

    2001-01-01

    The production of dileptons from the chemically equilibrating quark gluon plasma in the intermediate mass region has been studied. Comparing with the calculated results based on the thermodynamic equilibrium system of quark gluon plasma, it has been found that the quark phase of the chemically equilibrating system gives rise to an even larger enhancement of the dileptons production. Therefore, such an enhancement of dilepton production may signal the formation of quark gluon plasma.

  5. Numerical simulation of chemical processes in helium plasmas in atmosphere environment

    Institute of Scientific and Technical Information of China (English)

    欧阳建明; 郭伟; 王龙; 邵福球

    2005-01-01

    A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.

  6. The Role of Plasma in Plasma Enhanced Chemical Vapour Deposition of Nanostructure Growth

    Science.gov (United States)

    Hash, David B.; Meyyappan, M.; Teo, Kenneth B. K.; Lacerda, Rodrigo G.; Rupesinghe, Nalin L.

    2004-01-01

    Chemical vapour deposition (CVD) has become the preferred process for high yield growth of carbon nanotubes and nanofibres because of its ability to pattern growth through lithographic positioning of transition metal catalysts on substrates. Many potential applications of nanotubes such as field emitters [1] require not only patterned growth but also vertical alignment. Some degree of ali,ment in thermal CVD processes can be obtained when carbon nanotubes are grown closely together as a result of van der Waals interactions. The ali,onment however is marginal, and the van der Waals prerequisite makes growth of freestanding nanofibres with thermal CVD unrealizable. The application of electric fields as a means of ali,onment has been shown to overcome this limitation [2-5], and highly aligned nanostructures can be grown if electric fields on the order of 0.5 V/microns are employed. Plasma enhanced CVD in various configurations including dc, rf, microwave, inductive and electron cyclotron resonance has been pursued as a means of enabling alignment in the CVD process. However, the sheath fields for the non-dc sources are in general not sufficient for a high degree of ali,pment and an additional dc bias is usually applied to the growth substrate. This begs the question as to the actual role of the plasma. It is clear that the plasma itself is not required for aligned growth as references [3] and [4] employed fields through small applied voltages (3-20 V) across very small electrode spacings (10-100 microns) and thus avoided striking a discharge.

  7. Ag films grown by remote plasma enhanced atomic layer deposition on different substrates

    Energy Technology Data Exchange (ETDEWEB)

    Amusan, Akinwumi A., E-mail: akinwumi.amusan@ovgu.de; Kalkofen, Bodo; Burte, Edmund P. [Institute of Micro and Sensor Systems, Otto-von-Guericke University, Universitätsplatz 2, 39106 Magdeburg (Germany); Gargouri, Hassan; Wandel, Klaus; Pinnow, Cay [SENTECH Instruments GmbH, Schwarzschildstraße 2, 12489 Berlin (Germany); Lisker, Marco [IHP, Im Technologiepark 25, 15236 Frankfurt (Oder) (Germany)

    2016-01-15

    Silver (Ag) layers were deposited by remote plasma enhanced atomic layer deposition (PALD) using Ag(fod)(PEt{sub 3}) (fod = 2,2-dimethyl-6,6,7,7,8,8,8-heptafluorooctane-3,5-dionato) as precursor and hydrogen plasma on silicon substrate covered with thin films of SiO{sub 2}, TiN, Ti/TiN, Co, Ni, and W at different deposition temperatures from 70  to 200 °C. The deposited silver films were analyzed by x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), scanning electron microscopy (SEM), transmission electron microscopy (TEM) with energy dispersive x-ray spectroscopy, four point probe measurement, ellipsometric measurement, x-ray fluorescence (XRF), and x-ray diffraction (XRD). XPS revealed pure Ag with carbon and oxygen contamination close to the detection limit after 30 s argon sputtering for depositions made at 120 and 200 °C substrate temperatures. However, an oxygen contamination was detected in the Ag film deposited at 70 °C after 12 s argon sputtering. A resistivity of 5.7 × 10{sup −6} Ω cm was obtained for approximately 97 nm Ag film on SiO{sub 2}/Si substrate. The thickness was determined from the SEM cross section on the SiO{sub 2}/Si substrate and also compared with XRF measurements. Polycrystalline cubic Ag reflections were identified from XRD for PALD Ag films deposited at 120 and 200 °C. Compared to W surface, where poor adhesion of the films was found, Co, Ni, TiN, Ti/TiN and SiO{sub 2} surfaces had better adhesion for silver films as revealed by SEM, TEM, and AFM images.

  8. Effect of vacuum conditions and plasma concentration on the chemical composition and adhesion of vacuum-plasma coatings

    Science.gov (United States)

    Borisov, D. P.; Kuznetsov, V. M.; Slabodchikov, V. A.

    2015-11-01

    The paper reports on the chemical composition of titanium nitride (TiN) and silicon (Si) coatings deposited with a new technological vacuum plasma setup which comprises magnetron sputtering systems, arc evaporators, and an efficient plasma generator. It is shown that due to highly clean vacuum conditions and highly clean surface treatment in the gas discharge plasma, both the coating-substrate interface and the coatings as such are almost free from oxygen and carbon. It is found that the coating-substrate interface represents a layer of thickness ≥ 60 nm formed through vacuum plasma mixing of the coating and substrate materials. The TiN coatings obtained on the new equipment display a higher adhesion compared to brass coatings deposited by industrial technologies via intermediate titanium oxide layers. It is concluded that the designed vacuum plasma equipment allows efficient surface modification of materials and articles by vacuum plasma immersion processes.

  9. Radial variation of sulfur and oxygen ions in the Io plasma torus as deduced from remote observations by Hisaki

    Science.gov (United States)

    Yoshioka, K.; Tsuchiya, F.; Kimura, T.; Kagitani, M.; Murakami, G.; Yamazaki, A.; Kuwabara, M.; Suzuki, F.; Hikida, R.; Yoshikawa, I.; Bagenal, F.; Fujimoto, M.

    2017-03-01

    The Io plasma torus, situated in the Jovian inner magnetosphere (6-8 Jovian radii from the planet) is filled with heavy ions and electrons, a large part of which are derived from Io's volcanos. The torus is the key area connecting the primary source of plasma (Io) with the midmagnetosphere (>10 Jovian radii), where highly dynamic phenomena are taking place. Revealing the plasma behavior of the torus is a key factor in elucidating Jovian magnetospheric dynamics. A global picture of the Io plasma torus can be obtained via spectral diagnosis of remotely sensed ion emissions generated via electron impact excitation. Hisaki, an Earth-orbiting spacecraft equipped with an extreme ultraviolet spectrograph Extreme Ultraviolet Spectroscope for Exospheric Dynamics, has observed the torus at moderate spectral resolution. The data have been submitted to spectral analysis and physical chemistry modeling under the assumption of axial symmetry. Results from the investigation are radial profiles of several important parameters including electron density and temperature as well as ion abundances. The inward transport timescale of midmagnetospheric plasma is obtained to be 2-40 h from the derived radial profile for the abundance of suprathermal electrons. The physical chemistry modeling results in a timescale for the outward transport of Io-derived plasma of around 30 days. The ratio between inward and outward plasma speed ( 1%) is consistent with the occurrence rate of depleted flux tubes determined using in situ observations by instruments on the Galileo spacecraft.

  10. Spaceborne Remote Sensing of Aerosol Type: Global Distribution, Model Evaluation and Translation into Chemical Speciation

    Science.gov (United States)

    Kacenelenbogen, M. S.; Tan, Q.; Johnson, M. S.; Burton, S. P.; Redemann, J.; Hasekamp, O. P.; Dawson, K. W.; Hair, J. W.; Ferrare, R. A.; Butler, C. F.; Holben, B. N.; Beyersdorf, A. J.; Ziemba, L. D.; Froyd, K. D.; Dibb, J. E.; Shingler, T.; Sorooshian, A.; Jimenez, J. L.; Campuzano Jost, P.; Jacob, D.; Kim, P. S.; Travis, K.; Lacagnina, C.

    2016-12-01

    It is essential to evaluate and refine aerosol classification methods applied to passive satellite remote sensing. We have developed an aerosol classification algorithm (called Specified Clustering and Mahalanobis Classification, SCMC) that assigns an aerosol type to multi-parameter retrievals by spaceborne, airborne or ground-based passive remote sensing instruments [1]. The aerosol types identified by our scheme are pure dust, polluted dust, urban-industrial/developed economy, urban-industrial/developing economy, dark biomass smoke, light biomass smoke and pure marine. We apply the SCMC method to inversions from the ground-based AErosol RObotic NETwork (AERONET [2]) and retrievals from the space-borne Polarization and Directionality of Earth's Reflectances instrument (POLDER, [3]). The POLDER retrievals that we use differ from the standard POLDER retrievals [4] as they make full use of multi-angle, multispectral polarimetric data [5]. We analyze agreement in the aerosol types inferred from both AERONET and POLDER and evaluate GEOS-Chem [6] simulations over the globe. Finally, we use in-situ observations from the SEAC4RS airborne field experiment to bridge the gap between remote sensing-inferred qualitative SCMC aerosol types and their corresponding quantitative chemical speciation. We apply the SCMC method to airborne in-situ observations from the NASA Langley Aerosol Research Group Experiment (LARGE, [7]) and the Differential Aerosol Sizing and Hygroscopicity Spectrometer Probe (DASH-SP, [8]) instruments; we then relate each coarsely defined SCMC type to a sum of percentage of individual aerosol species, using in-situ observations from the Particle Analysis by Laser Mass Spectrometry (PALMS, [9]), the Soluble Acidic Gases and Aerosol (SAGA, [10]), and the High - Resolution Time - of - Flight Aerosol Mass Spectrometer (HR ToF AMS, [11]). [1] Russell P. B., et al., JGR, 119.16 (2014) [2] Holben B. N., et al., RSE, 66.1 (1998) [3] Tanré D., et al., AMT, 4.7 (2011

  11. Electroluminescence and photoluminescence of conjugated polymer films prepared by plasma enhanced chemical vapor deposition of naphthalene

    CERN Document Server

    Rajabi, Mojtaaba; Firouzjah, Marzieh Abbasi; Hosseini, Seyed Iman; Shokri, Babak

    2012-01-01

    Polymer light-emitting devices were fabricated utilizing plasma polymerized thin films as emissive layers. These conjugated polymer films were prepared by RF Plasma Enhanced Chemical Vapor Deposition (PECVD) using naphthalene as monomer. The effect of different applied powers on the chemical structure and optical properties of the conjugated polymers was investigated. The fabricated devices with structure of ITO/PEDOT:PSS/ plasma polymerized Naphthalene/Alq3/Al showed broadband Electroluminescence (EL) emission peaks with center at 535-550 nm. Using different structural and optical tests, connection between polymers chemical structure and optical properties under different plasma powers has been studied. Fourier transform infrared (FTIR) and Raman spectroscopies confirmed that a conjugated polymer film with a 3-D cross-linked network was developed. By increasing the power, products tended to form as highly cross-linked polymer films. Photoluminescence (PL) spectra of plasma polymers showed different excimerc ...

  12. Induction of apoptosis in human myeloid leukemia cells by remote exposure of resistive barrier cold plasma.

    Science.gov (United States)

    Thiyagarajan, Magesh; Anderson, Heather; Gonzales, Xavier F

    2014-03-01

    Cold atmospheric plasma (CAP), an ambient temperature ionized gas, is gaining extensive interest as a promising addition to anti-tumor therapy primarily due to the ability to generate and control delivery of electrons, ions, excited molecules, UV photons, and reactive species such as reactive oxygen species (ROS) and reactive nitrogen species (RNS) to a specific site. The heterogeneous composition of CAP offers the opportunity to mediate several signaling pathways that regulate tumor cells. Consequently, the array of CAP generated products has limited the identification of the mechanisms of action on tumor cells. The aim of this work is to assess the cell death response of human myeloid leukemia cells by remote exposure to CAP generated RNS by utilizing a novel resistive barrier discharge system that primarily produces RNS. The effect of variable treatments of CAP generated RNS was tested in THP-1 cell (human monocytic leukemia cell line), a model for hematological malignancy. The number of viable cells was evaluated with erythrosine-B staining, while apoptosis and necrosis was assessed by endonuclease cleavage observed by agarose gel electrophoresis and detection of cells with the exclusionary dye propidium iodide and fluorescently labeled annexin-V by flow cytometry and fluorescent microscopy. Our observations indicate that treatment dosage levels of 45 s of exposure to CAP emitted RNS-induced apoptotic cell death and for higher dosage conditions of ≥50 s of exposure to CAP induced necrosis. Overall the results suggest that CAP emitted RNS play a significant role in the anti-tumor potential of CAP.

  13. Chemical modification of amino acids by atmospheric-pressure cold plasma in aqueous solution

    Science.gov (United States)

    Takai, Eisuke; Kitamura, Tsuyoshi; Kuwabara, Junpei; Ikawa, Satoshi; Yoshizawa, Shunsuke; Shiraki, Kentaro; Kawasaki, Hideya; Arakawa, Ryuichi; Kitano, Katsuhisa

    2014-07-01

    Plasma medicine is an attractive new research area, but the principles of plasma modification of biomolecules in aqueous solution remain elusive. In this study, we investigated the chemical effects of atmospheric-pressure cold plasma on 20 naturally occurring amino acids in aqueous solution. High-resolution mass spectrometry revealed that chemical modifications of 14 amino acids were observed after plasma treatment: (i) hydroxylation and nitration of aromatic rings in tyrosine, phenylalanine and tryptophan; (ii) sulfonation and disulfide linkage formation of thiol groups in cysteine; (iii) sulfoxidation of methionine and (iv) amidation and ring-opening of five-membered rings in histidine and proline. A competitive reaction experiment using 20 amino acids demonstrated that sulfur-containing and aromatic amino acids were preferentially decreased by the plasma treatment. These data provide fundamental information for elucidating the mechanism of protein inactivation for biomedical plasma applications.

  14. Simulation of low-temperature, atmospheric-pressure plasma enhanced chemical vapor deposition reactors

    OpenAIRE

    Lorant, Christophe; Descamps, Pierre; De Wilde, Juray; 1st BeLux workshop on “Coating, Materials, surfaces and Interfaces

    2014-01-01

    The simulation of low-temperature, atmospheric-pressure plasma enhanced chemical vapor deposition reactors is challenging due to the coupling of the fluid dynamics, the chemical reactions and the electric field and the stiffness of the resulting mathematical system. The model equations and the rigorous model reduction to reduce the stiffness are addressed in this paper. Considering pure nitrogen plasma, simulations with two configurations are discussed.

  15. Electrical properties of plasma-deposited silicon oxide clarified by chemical modeling

    NARCIS (Netherlands)

    Kovalgin, A.Y.; Boogaard, A.; Brunets, I.; Aarnink, A.A.I.; Wolters, R.A.M.

    2009-01-01

    Our study is focused on Plasma Enhanced Chemical Vapor Deposition (PECVD) of silicon dioxide films at low temperatures (< 150 oC) using Inductively Coupled (IC) High-Density (HD) plasma source. We recently fabricated Thin Film Transistors (TFTs) with high-quality ICPECVD gate oxides, which exhibited

  16. Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses

    NARCIS (Netherlands)

    Dingemans, G.; M. C. M. van de Sanden,; Kessels, W. M. M.

    2012-01-01

    An alternative plasma-enhanced chemical vapor deposition (PECVD) method is developed and applied for the deposition of high-quality aluminum oxide (AlOx) films. The PECVD method combines a continuous plasma with ultrashort precursor injection pulses. We demonstrate that the modulation of the precurs

  17. Carbon nanofiber growth in plasma-enhanced chemical vapor deposition

    Science.gov (United States)

    Denysenko, I.; Ostrikov, K.; Cvelbar, U.; Mozetic, M.; Azarenkov, N. A.

    2008-10-01

    A theoretical model to describe the plasma-assisted growth of carbon nanofibers (CNFs) is proposed. Using the model, the plasma-related effects on the nanofiber growth parameters, such as the growth rate due to surface and bulk diffusion, the effective carbon flux to the catalyst surface, the characteristic residence time and diffusion length of carbon atoms on the catalyst surface, and the surface coverages, have been studied. The dependence of these parameters on the catalyst surface temperature and ion and etching gas fluxes to the catalyst surface is quantified. The optimum conditions under which a low-temperature plasma environment can benefit the CNF growth are formulated. These results are in good agreement with the available experimental data on CNF growth and can be used for optimizing synthesis of related nanoassemblies in low-temperature plasma-assisted nanofabrication.

  18. Retrieval algorithm of quantitative analysis of passive Fourier transform infrared (FTRD) remote sensing measurements of chemical gas cloud from measuring the transmissivity by passive remote Fourier transform infrared

    Institute of Scientific and Technical Information of China (English)

    Liu Zhi-Ming; Liu Wen-qing; Gao Ming-Guang; Tong Jing-Jing; Zhang Wian-Shu; Xu Liang; Wei Xiuai

    2008-01-01

    Passive Fourier transform infrared (FTIR) remote sensing measurement of chemical gas cloud is a vital technology.It takes an important part in many fields for the detection of released gases.The principle of concentration measurement is based on the Beer-Lambert law.Unlike the active measurement,for the passive remote sensing,in most cases,the difference between the temperature of the gas cloud and the brightness temperature of the background is usually a few kelvins.The gas cloud emission is almost equal to the background emission,thereby the emission of the gas cloud cannot be ignored.The concentration retrieval algorithm is quite different from the active measurement.In this paper,the concentration retrieval algorithm for the passive FTIR remote measurement of gas cloud is presented in detail,which involves radiative transfer model,radiometric calibration,absorption coefficient calculation,et al.The background spectrum has a broad feature,which is a slowly varying function of frequency.In this paper,the background spectrum is fitted with a polynomial by using the Levenberg-Marquardt method which is a kind of nonlinear least squares fitting algorithm.No background spectra are required.Thus,this method allows mobile,real-time and fast measurements of gas clouds.

  19. Absolute vacuum ultraviolet flux in inductively coupled plasmas and chemical modifications of 193 nm photoresist

    Science.gov (United States)

    Titus, M. J.; Nest, D.; Graves, D. B.

    2009-04-01

    Vacuum ultraviolet (VUV) photons in plasma processing systems are known to alter surface chemistry and may damage gate dielectrics and photoresist. We characterize absolute VUV fluxes to surfaces exposed in an inductively coupled argon plasma, 1-50 mTorr, 25-400 W, using a calibrated VUV spectrometer. We also demonstrate an alternative method to estimate VUV fluence in an inductively coupled plasma (ICP) reactor using a chemical dosimeter-type monitor. We illustrate the technique with argon ICP and xenon lamp exposure experiments, comparing direct VUV measurements with measured chemical changes in 193 nm photoresist-covered Si wafers following VUV exposure.

  20. Basic analytical investigation of plasma-chemically modified carbon fibers

    Energy Technology Data Exchange (ETDEWEB)

    Bubert, H.; Ai, X.; Haiber, S.; Heintze, M.; Brueser, V.; Pasch, E.; Brandl, W.; Marginean, G

    2002-10-15

    The background of the present investigation is to enhance the overall adherence of vapor grown carbon fibers (VGCF) to the surrounding polymer matrix in different applications by forming polar groups at their surfaces and by modifying the surface morphology. This has been done by plasma treatments using a low-pressure plasma with different gases, flow rates, pressures and powers. Two different types of carbon fibers were investigated: carbon microfibers and carbon nanofibers. The characterization of fiber surfaces was achieved by photoelectron spectroscopy (XPS), contact angle measurements and titration. These investigations were accompanied by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The oxygen plasma treatment of the fibers changes the surfaces by forming a layer with a thickness of the order of one nanometer mainly consisting of functional groups like hydroxyl, carbonyl and carboxyl. After functionalization of the complete surface, a further plasma treatment does not enhance the superficial oxygen content but changes slightly the portions of the functional groups. A comparison of the methods applied provides a largely consistent image of the effect of plasma treatment.

  1. Plasma-chemical Synthesis and Regeneration of Catalysts for CH4 Steam Conversion

    Institute of Scientific and Technical Information of China (English)

    2002-01-01

    We carried out experimental studies concerning the plasma-chemical synthesis(PCS) of a catalyst for CH4 steam conversion and designed and built the equipment for PCS and/ or regeneration of spent catalyst for CH4 steam conversion. Under the conditions of an electric-arc low-temperature plasma (LTP), we studied the Ni-O-Al system and performed a comprehensive physicochemical analysis of the ultradispersed product obtained. It's the first time worldwide when the conditions of plasma-chemical synthesis and/ or regeneration of CH4 steam conversion catalysts under the conditions of electric-arc LTP are investigated depending on the plasma-chemical process (PCP) parameters and the plasma-chemical reactor (PCP) type (with CW-"cold walls" Tw = 500 K or WW-"warm walls" Tw = 1500 K), samples with a specific surface of 120 m2/g are obtained. Plasma-chemically synthesized and/ or regenerated samples have a homogenous chemical composition similar to that the Girdller (USA) conventional industrial catalyst. It is empirically established that the optimal temperature range in PCR for synthesis of samples with maximum dispersity is (2000 ~ 3000) K. Results from investigation on dynamics and kinetics of plasma-chemically synthesized and / or regenerated catalysts for CH4 steam conversion show that under LTP conditions premises for the formation of catalyst compositions are established. They are reduced 3 to 4 times faster than their industrial analogues. High specific surface of the samples, homogenous composition, high rate of active chemical surface formed by reduction, faulty crystal lattice of catalytically active phases and mostly high catalytic activity make them a potential competitor with their industrial analogues for their probable production in catalyst shops.

  2. Activating basal-plane catalytic activity of two-dimensional MoS2 monolayer with remote hydrogen plasma

    KAUST Repository

    Cheng, Chia-Chin

    2016-09-10

    Two-dimensional layered transition metal dichalcogenide (TMD) materials such as Molybdenum disufide (MoS2) have been recognized as one of the low-cost and efficient electrocatalysts for hydrogen evolution reaction (HER). The crystal edges that account for a small percentage of the surface area, rather than the basal planes, of MoS2 monolayer have been confirmed as their active catalytic sites. As a result, extensive efforts have been developing in activating the basal planes of MoS2 for enhancing their HER activity. Here, we report a simple and efficient approach-using a remote hydrogen-plasma process-to creating S-vacancies on the basal plane of monolayer crystalline MoS2; this process can generate high density of S-vacancies while mainly maintaining the morphology and structure of MoS2 monolayer. The density of S-vacancies (defects) on MoS2 monolayers resulted from the remote hydrogen-plasma process can be tuned and play a critical role in HER, as evidenced in the results of our spectroscopic and electrical measurements. The H2-plasma treated MoS2 also provides an excellent platform for systematic and fundamental study of defect-property relationships in TMDs, which provides insights for future applications including electrical, optical and magnetic devices. © 2016 Elsevier Ltd.

  3. Photons from a Chemically Equilibrating Quark-Gluon Plasma at Finite Baryon Density

    Institute of Scientific and Technical Information of China (English)

    HE Ze-Jun; LONG Jia-Li; MA Yu-Gang; MA Guo-Liang

    2005-01-01

    @@ We study hard photon production in a chemically equilibrating quark-gluon plasma at finite baryon density based on the Jüttner distribution of partons of the system. We find that the photon yield is a strongly increasing function of the initial quark chemical potential.

  4. Chemical erosion of different carbon composites under ITER-relevant plasma conditions

    NARCIS (Netherlands)

    Westerhout, J.; Borodin, D.; Al, R.S.; Brezinsek, S.; Hoen, Mhjt; Kirschner, A.; Lisgo, S.; van der Meiden, H. J.; Philipps, V.; van de Pol, M.J.; Shumack, A. E.; De Temmerman, G.; Vijvers, W. A. J.; Wright, G. M.; Cardozo, N. J. L.; Rapp, J.; van Rooij, G. J.

    2009-01-01

    We have studied the chemical erosion of different carbon composites in Pilot-PSI at ITER-relevant hydrogen plasma fluxes (similar to 10(24) m(-2) s(-1)) and low electron temperatures (T-e similar to 1 eV). Optical emission spectroscopy on the CH A-X band was used to characterize the chemical

  5. Modification of optical and electrical properties of chemical bath deposited CdS using plasma treatments

    Energy Technology Data Exchange (ETDEWEB)

    Gonzalez, G. [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, San Nicolas de los Garza, Nuevo Leon, C.P 66450 (Mexico); Krishnan, B. [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, San Nicolas de los Garza, Nuevo Leon, C.P 66450 (Mexico); CIIDIT, Universidad Autonoma de Nuevo Leon, Apodaca, Nuevo Leon (Mexico); Avellaneda, D.; Castillo, G. Alan; Das Roy, T.K. [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, San Nicolas de los Garza, Nuevo Leon, C.P 66450 (Mexico); Shaji, S., E-mail: sshajis@yahoo.com [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, San Nicolas de los Garza, Nuevo Leon, C.P 66450 (Mexico); CIIDIT, Universidad Autonoma de Nuevo Leon, Apodaca, Nuevo Leon (Mexico)

    2011-08-31

    Cadmium sulphide (CdS) is a well known n-type semiconductor that is widely used in solar cells. Here we report preparation and characterization of chemical bath deposited CdS thin films and modification of their optical and electrical properties using plasma treatments. CdS thin films were prepared from a chemical bath containing Cadmium chloride, Triethanolamine and Thiourea under various deposition conditions. Good quality thin films were obtained during deposition times of 5, 10 and 15 min. CdS thin films prepared for 10 min. were treated using a glow discharge plasma having nitrogen and argon carrier gases. The changes in morphology, optical and electrical properties of these plasma treated CdS thin films were analyzed in detail. The results obtained show that plasma treatment is an effective technique in modification of the optical and electrical properties of chemical bath deposited CdS thin films.

  6. A study on III-nitride recessed-gate field-effect transistors using a remote-oxygen-plasma treatment

    Science.gov (United States)

    Lee, Y.-C.; Kao, T.-T.; Shen, S.-C.

    2015-04-01

    We report a comparative study of the device performance of III-nitride (III-N) heterojunction field-effect transistors (HFETs) and metal-insulator-semiconductor field-effect transistors (MISFETs). The influence of a remote-oxygen-plasma treatment was investigated. The plasma-treated recessed-gate HFETs and MISFETs show normally-off characteristics with higher peak transconductance, lower sub-threshold slope, smaller hysteresis. An on-off ratio greater than 2.2E11 with a significant suppression of gate leakage can be achieved in plasma-treated III-N MISFETs. A drain current transient measurement was performed to analyze the traps in these devices and possible origins of these traps are studied. Six traps with characteristic time constants (τ) ranging from 180 s to 3 ms are identified in both HFETs and MISFETs, in addition to a trap which is associated with the ALD-grown gate dielectrics for the MISFETs. The results suggest that improved device performance in these plasma-treated III-N FETs is attributed to the reduced trap states with τ 2 s) cannot be reduced by the plasma treatment and are related to the oxygen and carbon impurities and the buffer traps in the bulk semiconductors.

  7. Plasma chemical production of stable isotopes of germanium from its fluorides

    Science.gov (United States)

    Kornev, Roman; Sennikov, Peter

    2016-08-01

    The reduction process of 72GeF4 in hydrogen plasma of RF-discharge (13.56 MHz) was experimentally investigated. It was found that 72Ge, polyfluorogermanes and gaseous HF were the main products of conversion. The behavior of the main electroactive impurities and of metal impurities in the process of hydrogen reduction of 72GeF4 was considered. Based on the data of emission spectroscopy of chemically active plasma, assumptions were made about the main plasma-chemical reactions responsible for the process of hydrogen reduction of 72GeF4. A single crystal of n-type with concentration of charge carriers of Czochralski method after the process of zone recrystallization of 72Ge. Contribution to the topical issue "6th Central European Symposium on Plasma Chemistry (CESPC-6)", edited by Nicolas Gherardi, Ester Marotta and Cristina Paradisi

  8. Structuring of DLC:Ag nanocomposite thin films employing plasma chemical etching and ion sputtering

    Science.gov (United States)

    Tamulevičius, Tomas; Tamulevičienė, Asta; Virganavičius, Dainius; Vasiliauskas, Andrius; Kopustinskas, Vitoldas; Meškinis, Šarūnas; Tamulevičius, Sigitas

    2014-12-01

    We analyze structuring effects of diamond like carbon based silver nanocomposite (DLC:Ag) thin films by CF4/O2 plasma chemical etching and Ar+ sputtering. DLC:Ag films were deposited employing unbalanced reactive magnetron sputtering of silver target with Ar+ in C2H2 gas atmosphere. Films with different silver content (0.6-12.9 at.%) were analyzed. The films (as deposited and exposed to plasma chemical etching) were characterized employing scanning electron microscopy and energy dispersive X-ray analysis (SEM/EDS), optical microscopy, ultraviolet-visible light (UV-VIS) spectroscopy and Fourier transform infrared (FTIR) spectroscopy. After deposition, the films were plasma chemically etched in CF4/O2 mixture plasma for 2-6 min. It is shown that optical properties of thin films and silver nano particle size distribution can be tailored during deposition changing the magnetron current and C2H2/Ar ratio or during following plasma chemical etching. The plasma etching enabled to reveal the silver filler particle size distribution and to control silver content on the surface that was found to be dependent on Ostwald ripening process of silver nano-clusters. Employing contact lithography and 4 μm period mask in photoresist or aluminum the films were patterned employing CF4/O2 mixture plasma chemical etching, direct Ar+ sputtering or combined etching processes. It is shown that different processing recipes result in different final grating structures. Selective carbon etching in CF4/O2 gas mixture with photoresist mask revealed micrometer range lines of silver nanoparticles, while Ar+ sputtering and combined processing employing aluminum mask resulted in nanocomposite material (DLC:Ag) micropatterns.

  9. Main species and chemical pathways in cold atmospheric-pressure Ar + H2O plasmas

    Science.gov (United States)

    Liu, Dingxin; Sun, Bowen; Iza, Felipe; Xu, Dehui; Wang, Xiaohua; Rong, Mingzhe; Kong, Michael G.

    2017-04-01

    Cold atmospheric-pressure plasmas in Ar + H2O gas mixtures are a promising alternative to He + H2O plasmas as both can produce reactive oxygen species of relevance for many applications and argon is cheaper than helium. Although He + H2O plasmas have been the subject of multiple experimental and computational studies, Ar + H2O plasmas have received less attention. In this work we investigate the composition and chemical pathways in Ar + H2O plasmas by means of a global model that incorporates 57 species and 1228 chemical reactions. Water vapor concentrations from 1 ppm to saturation (32 000 ppm) are considered in the study and abrupt transitions in power dissipation channels, species densities and chemical pathways are found when the water concentration increases from 100 to 1000 ppm. In this region the plasma transitions from an electropositive discharge in which most power is coupled to electrons into an electronegative one in which most power is coupled to ions. While increasing electronegativity is also observed in He + H2O plasmas, in Ar + H2O plasmas the transition is more abrupt because Penning processes do not contribute to gas ionization and the changes in the electron energy distribution function and mean electron energy caused by the increasing water concentration result in electron-neutral excitation and ionization rates changing by many orders of magnitude in a relatively small range of water concentrations. Insights into the main chemical species and pathways governing the production and loss of electrons, O, OH, OH(A) and H2O2 are provided as part of the study.

  10. Oxygen Barrier Coating Deposited by Novel Plasma-enhanced Chemical Vapor Deposition

    DEFF Research Database (Denmark)

    Jiang, Juan; Benter, M.; Taboryski, Rafael Jozef

    2010-01-01

    We report the use of a novel plasma-enhanced chemical vapor deposition chamber with coaxial electrode geometry for the SiOx deposition. This novel plasma setup exploits the diffusion of electrons through the inner most electrode to the interior samples space as the major energy source. This confi......, and it increased the barrier property of the modified low-density polyethylene, polyethylene terephthalate, and polylactide by 96.48%, 99.69%, and 99.25%, respectively....

  11. The Synergistic Effect between Electrical and Chemical Factors in Plasma Gene/Molecule-Transfection

    Science.gov (United States)

    Jinno, Masafumi

    2016-09-01

    This study has been done to know what kind of factors in plasma and processes on cells promote plasma gene/molecule transfection. We have discovered a new plasma source using a microcapillary electrode which enables high transfection efficiency and high cell survivability simultaneously. However, the mechanism of the transfection by plasma was not clear. To clarify the transfection mechanisms by micro plasma, we focused on the effects of electrical (current, charge, field, etc.) and chemical (radicals, RONS, etc.) factors generated by the micro plasma and evaluated the contribution weight of three groups of the effects and processes, i.e. electrical, chemical and biochemical ones. At first, the necessity of the electrical factors was estimated by the laser produced plasma (LPP). Mouse L-929 fibroblast cell was cultured on a 96-well plate or 12-well micro slide chamber. Plasmids pCX-EGFP in Tris-EDTA buffer was dropped on the cells and they were exposed to the capillary discharge plasma (CDP) or the LPP. In the case of the CDP, the plasma was generated between the tip of the capillary electrode and the cells so that both electrical and chemical factors were supplied to the cells. In this setup, about 20% of average transfection efficiency was obtained. In the case of the LPP, the plasma was generated apart from the cells so that electrical factors were not supplied to the cells. In this setup, no transfection was observed. These results show that the electrical factors are necessary for the plasma gene transfection. Next, the necessity of the chemical factors was estimated the effect of catalase to remove H2O2 in CDP. The transfection efficiency decreased to 0.4 by scavenging H2O2 with catalase. However, only the solution of H2O2 caused no gene transfection in cells. These results shows that H2O2 is important species to cause gene/molecule transfection but still needs a synergistic effect with electrical or other chemical factors. This work was partly supported by

  12. Fundamental limits on gas-phase chemical reduction of NOx in a plasma

    Energy Technology Data Exchange (ETDEWEB)

    Penetrante, B.M.; Hsiao, M.C.; Merritt, B.T.; Vogtlin, G.E. [Lawrence Livermore National Lab., CA (United States)

    1997-12-31

    In the plasma, the electrons do not react directly with the NOx molecules. The electrons collide mainly with the background gas molecules like N{sub 2}, O{sub 2} and H{sub 2}O. Electron impact on these molecules result partly in dissociation reactions that produce reactive species like N, O and OH. The NOx in the engine exhaust gas initially consist mostly of NO. The ground state nitrogen atom, N, is the only species that could lead to the chemical reduction of NO to N{sub 2}. The O radical oxidizes NO to NO{sub 2} leaving the same amount of NOx. The OH radical converts NO{sub 2} to nitric acid. Acid products in the plasma can easily get adsorbed on surfaces in the plasma reactor and in the pipes. When undetected, the absence of these oxidation products can often be mistaken for chemical reduction of NOx. In this paper the authors will examine the gas-phase chemical reduction of NOx. They will show that under the best conditions, the plasma can chemically reduce 1.6 grams of NOx per brake-horsepower-hour [g(NOx)/bhp-hr] when 5% of the engine output energy is delivered to the plasma.

  13. Development and Testing of a High Capacity Plasma Chemical Reactor in the Ukraine

    Energy Technology Data Exchange (ETDEWEB)

    Reilly, Raymond W.

    2012-07-30

    This project, Development and Testing of a High Capacity Plasma Chemical Reactor in the Ukraine was established at the Kharkiv Institute of Physics and Technology (KIPT). The associated CRADA was established with Campbell Applied Physics (CAP) located in El Dorado Hills, California. This project extends an earlier project involving both CAP and KIPT conducted under a separate CRADA. The initial project developed the basic Plasma Chemical Reactor (PCR) for generation of ozone gas. This project built upon the technology developed in the first project, greatly enhancing the output of the PCR while also improving reliability and system control.

  14. Shape correction of optical surfaces using plasma chemical vaporization machining with a hemispherical tip electrode.

    Science.gov (United States)

    Takino, Hideo; Yamamura, Kazuya; Sano, Yasuhisa; Mori, Yuzo

    2012-01-20

    We propose a plasma chemical vaporization machining device with a hemispherical tip electrode for optical fabrication. Radio-frequency plasma is generated close to the electrode under atmospheric conditions, and a workpiece is scanned relative to the stationary electrode under three-axis motion control to remove target areas on a workpiece surface. Experimental results demonstrate that surface removal progresses although process gas is not forcibly supplied to the plasma. The correction of shape errors on conventionally polished spheres is performed. As a result, highly accurate smooth surfaces with the desired rms shape accuracy of 3 nm are successfully obtained, which confirms that the device is effective for the fabrication of optics.

  15. Photoluminescence of amorphous carbon films fabricated by layer-by-layer hydrogen plasma chemical annealing method

    Institute of Scientific and Technical Information of China (English)

    徐骏; 黄晓辉; 李伟; 王立; 陈坤基

    2002-01-01

    A method in which nanometre-thick film deposition was alternated with hydrogen plasma annealing (layer-by-layermethod) was applied to fabricate hydrogenated amorphous carbon films in a conventional plasma-enhanced chemicalvapour deposition system. It was found that the hydrogen plasma treatment could decrease the hydrogen concentrationin the films and change the sp2/sp3 ratio to some extent by chemical etching. Blue photoluminescence was observed atroom temperature, as a result of the reduction of sp2 clusters in the films.

  16. Diffusion in plasma: the Hall effect, compositional waves, and chemical spots

    CERN Document Server

    Urpin, Vadim

    2016-01-01

    We consider diffusion caused by a combined influence of the electric current and the Hall effect, and argue that such diffusion can form inhomogeneities of the chemical composition in plasma. The considered mechanism can be responsible for a formation of element spots in laboratory and astrophysical plasmas. This current-driven diffusion can be accompanied by propagation of a particular type waves in which the impurity number density oscillate alone. These compositional waves exist if the magnetic pressure in plasma is much greater than the gas pressure,

  17. Chemically reactive species in liquids generated by atmospheric-pressure plasmas and their roles in plasma medicine

    Energy Technology Data Exchange (ETDEWEB)

    Hamaguchi, Satoshi [Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871 (Japan)

    2013-07-11

    Plasmas whose gas temperatures are close to room temperature may be generated in ambient air or a gas at atmospheric pressure with the use of low-frequency high voltage or low-power radio-frequency (RF) or microwave power applied to electrodes. Such plasmas can serve as a powerful source of free radicals and/or chemically reactive species that arise from atoms and molecules of the ambient gas. Recently use of such plasmas for medical purposes has attracted much attention as they can be implemented in possible medical devices that can cause blood coagulation, heal wounds, facilitate angiogenesis, sterilize surgical devices as well as living tissues without harming healthy cells, and selectively inactivate cancer cells. Especially of interest among reactive species generated by atmospheric-pressure plasmas (APP) are reactive oxygen species (ROS) and reactive nitrogen species (RNS) that are generated in liquid phase. Since most living tissues and cells are immersed in liquids (such as blood or culture media), reactive species generated by APPs in the gas phase are transported to the liquid phase and possibly converted to different types of reactive species therein before causing some influence on the tissues or cells. In this study, the rate equations are solved to evaluate concentrations of various reactive species in pure water that are originated by plasma reactions in atmosphere and possible effects of such species (including ROS/RNS) on living tissues and cells are discussed.

  18. Drag force of Anisotropic plasma at finite U(1) chemical potential

    Energy Technology Data Exchange (ETDEWEB)

    Cheng, Long; Ge, Xian-Hui [Shanghai University, Department of Physics, Shanghai (China); Wu, Shang-Yu [National Chiao Tung University, Department of Electrophysics, Yau Shing Tung Center, Hsinchu (China); National Center for Theoretical Science, Hsinchu (China)

    2016-05-15

    We perform the calculation of the drag force acting on a massive quark moving through an anisotropic N = 4 SU(N) Super Yang-Mills plasma in the presence of a U(1) chemical potential. We present the numerical results for any value of the anisotropy and arbitrary direction of the quark velocity with respect to the direction of the anisotropy. We find the effect of the chemical potential or charge density will enhance the drag force for our charged solution. (orig.)

  19. Remote Handling and Plasma Conditions to Enable Fusion Nuclear Science R&D Using a US Component Testing Facility

    Energy Technology Data Exchange (ETDEWEB)

    Peng, Yueng Kay Martin [ORNL; Burgess, Thomas W [ORNL; Carroll, Adam J [ORNL; Neumeyer, C. L. [Princeton Plasma Physics Laboratory (PPPL); Canik, John [ORNL; Cole, Michael J [ORNL; Dorland, W. D. [University of Maryland; Fogarty, P. J. [Oak Ridge National Laboratory (ORNL); Grisham, L. [Princeton Plasma Physics Laboratory (PPPL); Hillis, Donald Lee [ORNL; Katoh, Yutai [ORNL; Korsah, Kofi [ORNL; Kotschenreuther, M. [University of Texas, Austin; LaHaye, R. [General Atomics, San Diego; Mahajan, S. [University of Texas, Austin; Majeski, R. [Princeton Plasma Physics Laboratory (PPPL); Nelson, Brad E [ORNL; Patton, Bradley D [ORNL; Rasmussen, David A [ORNL; Sabbagh, S. A. [Columbia University; Sontag, Aaron C [ORNL; Stoller, Roger E [ORNL; Tsai, C. C. [Oak Ridge National Laboratory (ORNL); Vanlanju, P. [University of Texas, Austin; Wagner, Jill C [ORNL; Yoder, III, Graydon L [ORNL

    2009-08-01

    The use of a fusion component testing facility to study and establish, during the ITER era, the remaining scientific and technical knowledge needed by fusion Demo is considered and described in this paper. This use aims to lest components in an integrated fusion nuclear environment, for the first time, to discover and understand the underpinning physical properties, and to develop improved components for further testing, in a time-efficient manner. It requires a design with extensive modularization and remote handling of activated components, and flexible hot-cell laboratories. It further requires reliable plasma conditions to avoid disruptions and minimize their impact, and designs to reduce the divertor heat flux to the level of ITER design. As the plasma duration is extended through the planned ITER level (similar to 10(3) s) and beyond, physical properties with increasing time constants, progressively for similar to 10(4) s, similar to 10(5) s, and similar to 10(6) s, would become accessible for testing and R&D. The longest time constants of these are likely to be of the order of a week ( 106 S). Progressive stages of research operation are envisioned in deuterium, deuterium-tritium for the ITER duration, and deuterium-tritium with increasingly longer plasma durations. The fusion neutron fluence and operational duty factor anticipated for this "scientific exploration" phase of a component test facility are estimated to be up to 1 MW-yr/m(2) and up to 10%, respectively.

  20. Network structural analysis using directed graph for chemical reaction analysis in weakly-ionized plasmas

    Science.gov (United States)

    Nobuto, Kyosuke; Mizui, Yasutaka; Miyagi, Shigeyuki; Sakai, Osamu; Murakami, Tomoyuki

    2016-09-01

    We visualize complicated chemical reaction systems in weakly-ionized plasmas by analysing network structure for chemical processes, and calculate some indexes by assuming interspecies relationships to be a network to clarify them. With the current social evolution, the mean size of general data which we can use in computers grows huge, and significance of the data analysis increases. The methods of the network analysis which we focus on in this study do not depend on a specific analysis target, but the field where it has been already applied is still limited. In this study, we analyse chemical reaction systems in plasmas for configuring the network structure. We visualize them by expressing a reaction system in a specific plasma by a directed graph and examine the indexes and the relations with the characteristic of the species in the reaction system. For example, in the methane plasma network, the centrality index reveals importance of CH3 in an influential position of species in the reaction. In addition, silane and atmospheric pressure plasmas can be also visualized in reaction networks, suggesting other characteristics in the centrality indexes.

  1. Expanding thermal plasma chemical vapour deposition of ZnO:Al layers for CIGS solar cells

    NARCIS (Netherlands)

    Sharma, K.; Williams, B.L.; Mittal, A.; Knoops, H.C.M.; Kniknie, B.J.; Bakker, N.J.; Kessels, W.M.M.; Schropp, R.E.I.; Creatore, M.

    2014-01-01

    Aluminium-doped zinc oxide (ZnO:Al) grown by expanding thermal plasma chemical vapour deposition (ETP-CVD) has demonstrated excellent electrical and optical properties, which make it an attractive candidate as a transparent conductive oxide for photovoltaic applications. However, when depositing ZnO

  2. A Review on Chemical Effects in Aqueous Solution induced by Plasma with Glow Discharge

    Institute of Scientific and Technical Information of China (English)

    2001-01-01

    Chemical effects in different aqueous solutions induced by plasma with glow dis charge electrolysis (GDE) and contact glow discharge electrolysis (CGDE) are described in this paper. The experimental and discharge characteristics are also reviewed. These are followed by a discussion of their mechanisms of both anodic and cathodic CGDE..

  3. Impact of Seminal Chemical Elements on the Oxidative Balance in Bovine Seminal Plasma and Spermatozoa

    OpenAIRE

    Eva Tvrdá; Norbert Lukáč; Monika Schneidgenová; Jana Lukáčová; Csaba Szabó; Zofia Goc; Agnieszka Greń; Peter Massányi

    2013-01-01

    Mutual relationships between selected chemical elements (Na, K, Fe, Cu, Mg, and Zn), basic motility characteristics (motility and progressive motility), and markers of the oxidative balance (superoxide dismutase, catalase, glutathione, albumin, and malondialdehyde) were investigated in bovine seminal plasma and spermatozoa. Computer assisted sperm analysis was used to assess the motility parameters; mineral concentrations were determined by the voltammetric method and flame absorption spectro...

  4. Expanding thermal plasma chemical vapour deposition of ZnO:Al layers for CIGS solar cells

    NARCIS (Netherlands)

    Sharma, K.; Williams, B.L.; Mittal, A.; Knoops, H.C.M.; Kniknie, B.J.; Bakker, N.J.; Kessels, W.M.M.; Schropp, R.E.I.; Creatore, M.

    2014-01-01

    Aluminium-doped zinc oxide (ZnO:Al) grown by expanding thermal plasma chemical vapour deposition (ETP-CVD) has demonstrated excellent electrical and optical properties, which make it an attractive candidate as a transparent conductive oxide for photovoltaic applications. However, when depositing ZnO

  5. Physical and chemical properties of dust produced in a N2-CH4 RF plasma discharge

    Science.gov (United States)

    Ouni, F.; Adande, G.; Thissen, R.; Alcouffe, G.; Szopa, C.; Schmitz-Afonso, I.; Laprévote, O.; Quirico, E.; Brissaud, O.; Carrasco, N.; Cernogora, G.

    2008-09-01

    Titan's atmospheric chemistry is simulated using a Capacitively Coupled Plasma discharge produced in a N2-CH4 mixture. The produced solid particles are analysed ex-situ. Chemical properties are deduced from: elemental composition, FTIR and LTQ-Orbitrap mass spectrometer. Optical properties are deduced from reflectivity in visible and IR range.

  6. PLASMA PROTEIN PROFILING AS A HIGH THROUGHPUT TOOL FOR CHEMICAL SCREENING USING A SMALL FISH MODEL

    Science.gov (United States)

    Hudson, R. Tod, Michael J. Hemmer, Kimberly A. Salinas, Sherry S. Wilkinson, James Watts, James T. Winstead, Peggy S. Harris, Amy Kirkpatrick and Calvin C. Walker. In press. Plasma Protein Profiling as a High Throughput Tool for Chemical Screening Using a Small Fish Model (Abstra...

  7. Control of interface nanoscale structure created by plasma-enhanced chemical vapor deposition.

    Science.gov (United States)

    Peri, Someswara R; Akgun, Bulent; Satija, Sushil K; Jiang, Hao; Enlow, Jesse; Bunning, Timothy J; Foster, Mark D

    2011-09-01

    Tailoring the structure of films deposited by plasma-enhanced chemical vapor deposition (PECVD) to specific applications requires a depth-resolved understanding of how the interface structures in such films are impacted by variations in deposition parameters such as feed position and plasma power. Analysis of complementary X-ray and neutron reflectivity (XR, NR) data provide a rich picture of changes in structure with feed position and plasma power, with those changes resolved on the nanoscale. For plasma-polymerized octafluorocyclobutane (PP-OFCB) films, a region of distinct chemical composition and lower cross-link density is found at the substrate interface for the range of processing conditions studied and a surface layer of lower cross-link density also appears when plasma power exceeds 40 W. Varying the distance of the feed from the plasma impacts the degree of cross-linking in the film center, thickness of the surface layer, and thickness of the transition region at the substrate. Deposition at the highest power, 65 W, both enhances cross-linking and creates loose fragments with fluorine content higher than the average. The thickness of the low cross-link density region at the air interface plays an important role in determining the width of the interface built with a layer subsequently deposited atop the first.

  8. Experimental Studies of Microwave Reflection and Attenuation by Plasmas Produced by Burning Chemicals in Atmosphere

    Institute of Scientific and Technical Information of China (English)

    YUAN Zhongcai; SHI Jiaming; WANG Jiachun

    2007-01-01

    A series of chemicals are designed and prepared.With the method of thermodynamics,the average electron densities of the plasmas generated by burning chemicals are calculated.The reflection and attenuation of the microwaves,in a frequency band of 2 GHz to 15 GHz,by the plasma are measured.The results of measurements indicate that the plasma can absorb the energies of the microwaves in a broad band and reflect them faintly.Moreover,theoretical discussion reveals that the electron-neutral collision is the major factor that results in the absorption in the wide band.By using Appleton equations,average collision frequencies and electron densities are calculated from the attenuations of microwaves.

  9. Plasma flow reactor for steady state monitoring of physical and chemical processes at high temperatures

    Science.gov (United States)

    Koroglu, Batikan; Mehl, Marco; Armstrong, Michael R.; Crowhurst, Jonathan C.; Weisz, David G.; Zaug, Joseph M.; Dai, Zurong; Radousky, Harry B.; Chernov, Alex; Ramon, Erick; Stavrou, Elissaios; Knight, Kim; Fabris, Andrea L.; Cappelli, Mark A.; Rose, Timothy P.

    2017-09-01

    We present the development of a steady state plasma flow reactor to investigate gas phase physical and chemical processes that occur at high temperature (1000 reactor consists of a glass tube that is attached to an inductively coupled argon plasma generator via an adaptor (ring flow injector). We have modeled the system using computational fluid dynamics simulations that are bounded by measured temperatures. In situ line-of-sight optical emission and absorption spectroscopy have been used to determine the structures and concentrations of molecules formed during rapid cooling of reactants after they pass through the plasma. Emission spectroscopy also enables us to determine the temperatures at which these dynamic processes occur. A sample collection probe inserted from the open end of the reactor is used to collect condensed materials and analyze them ex situ using electron microscopy. The preliminary results of two separate investigations involving the condensation of metal oxides and chemical kinetics of high-temperature gas reactions are discussed.

  10. Plasma cortisol levels in captive wild felines after chemical restraint

    Directory of Open Access Journals (Sweden)

    G.P. Nogueira

    1997-11-01

    Full Text Available Eight Panthera onca (Po, 13 Felis concolor (Fc, 7 Felis yagouaroundi (Fy, 7 Felis tigrina (Ft and 5 Felis pardalis (Fp specimens from São Paulo State zoos were used. All animals were restrained with darts containing 10 mg/kg ketamine and 1 mg/kg xylazine. Venous blood samples were collected as soon as possible (within 15-20 min and serum was frozen until the time for cortisol quantification. Cortisol was determined using a solid phase radioimmunoassay with an intra-assay coefficient of 8.51%. Data were analyzed statistically by the Kruskal-Wallis test, followed by Dunn's multiple comparisons test, and the one-sample t-test, with the level of significance set at P<0.05. Data are reported as means ± SEM. Cortisol levels differed among the captive felines: Po = 166 ± 33a, Fc = 670 ± 118b, Fy = 480 ± 83b, Ft = 237 ± 42ab, Fp = 97 ± 12a nmol/l (values followed by different superscript letters were significantly different (P<0.001. Since most of the veterinary procedures on these species involve chemical restraint, these results show the necessity of preventive measures in order to minimize the effect of restraint stress on more susceptible species

  11. Tuning the Electrical Properties of Graphene via Nitrogen Plasma-Assisted Chemical Modification.

    Science.gov (United States)

    Jung, Min Wook; Song, Wooseok; Jung, Dae Sung; Lee, Sun Sook; Park, Chong-Yun; An, Ki-Seok

    2016-03-01

    The control in electrical properties of graphene is essentially required in order to realize graphenebased nanoelectronics. In this study, N-doped graphene was successfully obtained via nitrogen plasma treatment. Graphene was synthesized on copper foil using thermal chemical vapor deposition. After N2 plasma treatment, the G-band of the graphene was blueshifted and the intensity ratio of 2D- to G-bands decreased with increasing the plasma power. Pyrrolic-N bonding configuration induced by N2 plasma treatment was studied by X-ray photoelectron spectroscopy. Remarkably, electrical characterization including Hall measurement and I-V characteristics of the N-doped graphene exhibit semiconducting behavior as well as the n-type doping effect.

  12. Distributed Least-Squares Estimation of a Remote Chemical Source via Convex Combination in Wireless Sensor Networks

    Directory of Open Access Journals (Sweden)

    Meng-Li Cao

    2014-06-01

    Full Text Available This paper investigates the problem of locating a continuous chemical source using the concentration measurements provided by a wireless sensor network (WSN. Such a problem exists in various applications: eliminating explosives or drugs, detecting the leakage of noxious chemicals, etc. The limited power and bandwidth of WSNs have motivated collaborative in-network processing which is the focus of this paper. We propose a novel distributed least-squares estimation (DLSE method to solve the chemical source localization (CSL problem using a WSN. The DLSE method is realized by iteratively conducting convex combination of the locally estimated chemical source locations in a distributed manner. Performance assessments of our method are conducted using both simulations and real experiments. In the experiments, we propose a fitting method to identify both the release rate and the eddy diffusivity. The results show that the proposed DLSE method can overcome the negative interference of local minima and saddle points of the objective function, which would hinder the convergence of local search methods, especially in the case of locating a remote chemical source.

  13. Fusing Mobile In Situ Observations and Satellite Remote Sensing of Chemical Release Emissions to Improve Disaster Response

    Directory of Open Access Journals (Sweden)

    Ira Leifer

    2016-09-01

    Full Text Available Chemical release disasters have serious consequences, disrupting ecosystems, society, and causing significant loss of life. Mitigating the destructive impacts relies on identification and mapping, monitoring, and trajectory forecasting. Improvements in sensor capabilities are enabling airborne and spacebased remote sensing to support response activities. Key applications are improving transport models in complex terrain and improved disaster response.Chemical release disasters have serious consequences, disrupting ecosystems, society, and causing significant loss of life. Mitigating the destructive impacts relies on identification and mapping, monitoring, and trajectory forecasting. Improvements in sensor capabilities are enabling airborne and space-based remote sensing to support response activities. Key applications are improving transport models in complex terrain and improved disaster response.Understanding urban atmospheric transport in the Los Angeles Basin, where topographic influences on transport patterns are significant, was improved by leveraging the Aliso Canyon leak as an atmospheric tracer. Plume characterization data was collected by the AutoMObile trace Gas (AMOG Surveyor, a commuter car modified for science. Mobile surface in situ CH4 and winds were measured by AMOG Surveyor under Santa Ana conditions to estimate an emission rate of 365±30% Gg yr-1. Vertical profiles were collected by AMOG Surveyor by leveraging local topography for vertical profiling to identify the planetary boundary layer at ~700 m. Topography significantly constrained plume dispersion by up to a factor of two. The observed plume trajectory was used to validate satellite aerosol optical depth-inferred atmospheric transport, which suggested the plume first was driven offshore, but then veered back towards land. Numerical long-range transport model predictions confirm this interpretation. This study demonstrated a novel application of satellite aerosol remote

  14. The development and feasibility of a remote damage control resuscitation prehospital plasma transfusion protocol for warfarin reversal for patients with traumatic brain injury.

    Science.gov (United States)

    Zielinski, Martin D; Smoot, Dustin L; Stubbs, James R; Jenkins, Donald H; Park, Myung S; Zietlow, Scott P

    2013-01-01

    The rapid reversal of warfarin in the setting of traumatic brain injury (TBI) has been associated with improved outcomes. Until now, remote reversal of hypocoagulable states has not been possible in the prehospital environment. This manuscript describes the development and analysis of a prehospital plasma transfusion protocol to reverse warfarin at the earliest possible moment after TBI. A retrospective review of all TBI patients receiving plasma transfusion(s) in the prehospital environment for warfarin reversal between February 2009 and September 2010 was conducted. Thawed plasma was carried on every air ambulance flight centered at the main campus. A total of 2836 flights carried over 2500 units of thawed plasma throughout the study period. During this time, 16 patients received prehospital plasma resuscitation, five of who were on warfarin with a concurrent TBI. The median Injury Severity Score was 17 (8.5-27.5) with a median Glasgow Coma Score of 13 (8-15) and a mortality rate of 40%. A median of 2 (1.5-2.0) units of thawed plasma and 0 (0-0) units of RBCs were transfused en route. The pretransfusion point-of-care international normalized ratio improved from 3.1 (2.3-4.0) to 1.9 (1.3-3.6) upon trauma center admission (serum sample). One hundred percent of the transported, but unused, thawed plasma underwent subsequent transfusion prior to expiration. Remote prehospital plasma transfusions effectively reverse anticoagulation secondary to warfarin administration in TBI patients. It is feasible to transfuse thawed plasma in the prehospital setting via remote damage control techniques without increasing waste. Prospective studies are needed to determine if this practice can improve outcomes in this population. © 2013 American Association of Blood Banks.

  15. The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films

    Energy Technology Data Exchange (ETDEWEB)

    Jiang Hao [Materials Sci and Tech Applications, LLC, 409 Maple Springs Drive, Dayton OH 45458 (United States)]. E-mail: hao.jiang@wpafb.af.mil; Hong Lianggou [Materials Sci and Tech Applications, LLC, 409 Maple Springs Drive, Dayton OH 45458 (United States); Venkatasubramanian, N. [Research Institute, University of Dayton, 300 College Park, Dayton, OH 45469-0168 (United States); Grant, John T. [Research Institute, University of Dayton, 300 College Park, Dayton, OH 45469-0168 (United States); Eyink, Kurt [Air Force Research Laboratory, Materials Directorate, 3005 Hobson Way, Wright-Patterson Air Force Base, OH 45433-7707 (United States); Wiacek, Kevin [Air Force Research Laboratory, Propulsion Directorate, 1950 Fifth Street, Wright-Patterson Air Force Base, OH 45433-7251 (United States); Fries-Carr, Sandra [Air Force Research Laboratory, Propulsion Directorate, 1950 Fifth Street, Wright-Patterson Air Force Base, OH 45433-7251 (United States); Enlow, Jesse [Air Force Research Laboratory, Materials Directorate, 3005 Hobson Way, Wright-Patterson Air Force Base, OH 45433-7707 (United States); Bunning, Timothy J. [Air Force Research Laboratory, Materials Directorate, 3005 Hobson Way, Wright-Patterson Air Force Base, OH 45433-7707 (United States)

    2007-02-26

    Polymer dielectric films fabricated by plasma enhanced chemical vapor deposition (PECVD) have unique properties due to their dense crosslinked bulk structure. These spatially uniform films exhibit good adhesion to a variety of substrates, excellent chemical inertness, high thermal resistance, and are formed from an inexpensive, solvent-free, room temperature process. In this work, we studied the dielectric properties of plasma polymerized (PP) carbon-based polymer thin films prepared from two precursors, benzene and octafluorocyclobutane. Two different monomer feed locations, directly in the plasma zone or in the downstream region (DS) and two different pressures, 80 Pa (high pressure) or 6.7 Pa (low pressure), were used. The chemical structure of the PECVD films was examined by X-ray photoelectron spectroscopy and Fourier-transform infrared spectroscopy. The dielectric constant ({epsilon} {sub r}) and dielectric loss (tan {delta}) of the films were investigated over a range of frequencies up to 1 MHz and the dielectric strength (breakdown voltage) (F {sub b}) was characterized by the current-voltage method. Spectroscopic ellipsometry was performed to determine the film thickness and refractive index. Good dielectric properties were exhibited, as PP-benzene films formed in the high pressure, DS region showed a F{sub b} of 610 V/{mu}m, an {epsilon} {sub r} of 3.07, and a tan {delta} of 7.0 x 10{sup -3} at 1 kHz. The PECVD processing pressure has a significant effect on final film structure and the film's physical density has a strong impact on dielectric breakdown strength. Also noted was that the residual oxygen content in the PP-benzene films significantly affected the frequency dependences of the dielectric constant and loss.

  16. Comparative studies of chemically synthesized and RF plasma-polymerized poly(-toluidine)

    Indian Academy of Sciences (India)

    Shama Islam; G B V S Lakshmi; M Zulfequar; M Husain; Azher M Siddiqui

    2015-04-01

    Poly(-toluidine) (POT) polymer was synthesized by chemical method and RF plasma polymerization at a radio frequency (RF) power input of 15 W on ultrasonically cleaned glass and silicon wafer substrates. These samples were characterized by DC conductivity measurements, UV–visible, XRD and FTIR techniques. The DC-conductivity was measured at 410 K, which was found to increase by two orders of magnitude for thin film as compared to pellet samples. It has been observed that the activation energy increases for RF plasma-polymerized POT. Transmission and reflectance spectra were studied for measuring optical constants like absorption coefficient (), extinction coefficient (), optical band gap (g), Urbach energy (e), and refractive index (). From XRD studies, one can infer that the samples grown by both the methods are amorphous in nature. The results indicate that the structures of plasma-polymerized POT are rather different from polymers synthesized by conventional chemical methods, due to a higher degree of cross-linking and branching reactions in plasma polymerization. This makes them suitable for various electroactive devices. A higher and more stable conductivity can be obtained with RF plasma-polymerized POT which is much smoother and more uniform.

  17. The Process of Plasma Chemical Photoresist Film Ashing from the Surface of Silicon Wafers

    Directory of Open Access Journals (Sweden)

    Siarhei Bordusau

    2013-01-01

    Full Text Available At present, the research for finding new technical methods of treating materials with plasma, including the development of energy and resource saving technologies for microelectronic manufacturing, is particularly actual.In order to improve the efficiency of microwave plasma chemical ashing of photoresist films from the surface of silicon wafers a two-stage process of treating was developed. The idea of the developed process is that wafers coated with photoresist are pre-heated by microwave energy. This occurs because the microwave energy initially is not spent on the excitation and maintenance of a microwave discharge but it is absorbed by silicon wafers which have a high tangent of dielectric losses. During the next step after the excitation of the microwave discharge the interaction of oxygen plasma with a pre-heated photoresist films proceeds more intensively. The delay of the start of plasma forming process in the vacuum chamber of a plasmatron with respect to the beginning of microwave energy generation by a magnetron leads to the increase of the total rate of photoresist ashing from the surface of silicon wafers approximately 1.7 times. The advantage of this method of microwave plasma chemical processing of semi-conductor wafers is the possibility of intensifying the process without changing the design of microwave discharge module and without increasing the input microwave power supplied into the discharge.

  18. A mathematical model and simulation results of plasma enhanced chemical vapor deposition of silicon nitride films

    Science.gov (United States)

    Konakov, S. A.; Krzhizhanovskaya, V. V.

    2015-01-01

    We developed a mathematical model of Plasma Enhanced Chemical Vapor Deposition (PECVD) of silicon nitride thin films from SiH4-NH3-N2-Ar mixture, an important application in modern materials science. Our multiphysics model describes gas dynamics, chemical physics, plasma physics and electrodynamics. The PECVD technology is inherently multiscale, from macroscale processes in the chemical reactor to atomic-scale surface chemistry. Our macroscale model is based on Navier-Stokes equations for a transient laminar flow of a compressible chemically reacting gas mixture, together with the mass transfer and energy balance equations, Poisson equation for electric potential, electrons and ions balance equations. The chemical kinetics model includes 24 species and 58 reactions: 37 in the gas phase and 21 on the surface. A deposition model consists of three stages: adsorption to the surface, diffusion along the surface and embedding of products into the substrate. A new model has been validated on experimental results obtained with the "Plasmalab System 100" reactor. We present the mathematical model and simulation results investigating the influence of flow rate and source gas proportion on silicon nitride film growth rate and chemical composition.

  19. Covalent Nitrogen Doping and Compressive Strain in MoS2 by Remote N2 Plasma Exposure.

    Science.gov (United States)

    Azcatl, Angelica; Qin, Xiaoye; Prakash, Abhijith; Zhang, Chenxi; Cheng, Lanxia; Wang, Qingxiao; Lu, Ning; Kim, Moon J; Kim, Jiyoung; Cho, Kyeongjae; Addou, Rafik; Hinkle, Christopher L; Appenzeller, Joerg; Wallace, Robert M

    2016-09-14

    Controllable doping of two-dimensional materials is highly desired for ideal device performance in both hetero- and p-n homojunctions. Herein, we propose an effective strategy for doping of MoS2 with nitrogen through a remote N2 plasma surface treatment. By monitoring the surface chemistry of MoS2 upon N2 plasma exposure using in situ X-ray photoelectron spectroscopy, we identified the presence of covalently bonded nitrogen in MoS2, where substitution of the chalcogen sulfur by nitrogen is determined as the doping mechanism. Furthermore, the electrical characterization demonstrates that p-type doping of MoS2 is achieved by nitrogen doping, which is in agreement with theoretical predictions. Notably, we found that the presence of nitrogen can induce compressive strain in the MoS2 structure, which represents the first evidence of strain induced by substitutional doping in a transition metal dichalcogenide material. Finally, our first principle calculations support the experimental demonstration of such strain, and a correlation between nitrogen doping concentration and compressive strain in MoS2 is elucidated.

  20. Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    XUJun,GAOPeng; DINGWan-yu; LIXin; DENGXin-lu; DONGChuang

    2004-01-01

    Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transtorm infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C-N type.

  1. PumpKin: A tool to find principal pathways in plasma chemical models

    Science.gov (United States)

    Markosyan, A. H.; Luque, A.; Gordillo-Vázquez, F. J.; Ebert, U.

    2014-10-01

    PumpKin is a software package to find all principal pathways, i.e. the dominant reaction sequences, in chemical reaction systems. Although many tools are available to integrate numerically arbitrarily complex chemical reaction systems, few tools exist in order to analyze the results and interpret them in relatively simple terms. In particular, due to the large disparity in the lifetimes of the interacting components, it is often useful to group reactions into pathways that recycle the fastest species. This allows a researcher to focus on the slow chemical dynamics, eliminating the shortest timescales. Based on the algorithm described by Lehmann (2004), PumpKin automates the process of finding such pathways, allowing the user to analyze complex kinetics and to understand the consumption and production of a certain species of interest. We designed PumpKin with an emphasis on plasma chemical systems but it can also be applied to atmospheric modeling and to industrial applications such as plasma medicine and plasma-assisted combustion.

  2. CHEMKIN-III: A FORTRAN chemical kinetics package for the analysis of gas-phase chemical and plasma kinetics

    Energy Technology Data Exchange (ETDEWEB)

    Kee, R.J.; Rupley, F.M.; Meeks, E.; Miller, J.A.

    1996-05-01

    This document is the user`s manual for the third-generation CHEMKIN package. CHEMKIN is a software package whose purpose is to facilitate the formation, solution, and interpretation of problems involving elementary gas-phase chemical kinetics. It provides a flexible and powerful tool for incorporating complex chemical kinetics into simulations of fluid dynamics. The package consists of two major software components: an Interpreter and a Gas-Phase Subroutine Library. The Interpreter is a program that reads a symbolic description of an elementary, user-specified chemical reaction mechanism. One output from the Interpreter is a data file that forms a link to the Gas-Phase Subroutine Library. This library is a collection of about 100 highly modular FORTRAN subroutines that may be called to return information on equations of state, thermodynamic properties, and chemical production rates. CHEMKIN-III includes capabilities for treating multi-fluid plasma systems, that are not in thermal equilibrium. These new capabilities allow researchers to describe chemistry systems that are characterized by more than one temperature, in which reactions may depend on temperatures associated with different species; i.e. reactions may be driven by collisions with electrons, ions, or charge-neutral species. These new features have been implemented in such a way as to require little or no changes to CHEMKIN implementation for systems in thermal equilibrium, where all species share the same gas temperature. CHEMKIN-III now has the capability to handle weakly ionized plasma chemistry, especially for application related to advanced semiconductor processing.

  3. Elemental mass spectroscopy of remote surfaces from laser-induced plasmas

    Science.gov (United States)

    Situ, W.; DeYoung, R. J.

    1994-01-01

    The elemental mass analysis of laser-produced ions from Al, Cu, Ge, Ag, and a lunar simulant target when irradiated by a 400-mJ, 8-ns, Nd: YAG laser at 1 x 10(exp 9) W/cm(exp 2), is reported. Ions traveled down a 11.1-m evacuated tube to an ion-trap 1-m time-of-flight (TOF) mass spectrometer where an elemental mass spectrum was recorded. The amount of target material removed per laser pulse and the ionization fraction were measured. The ion spatial distribution was measured at 11.1-m distance and found to be near a fourth-power cosine distribution. These results indicate the ability to mass analyze a surface over a distance of many kilometers for lunar and asteroid surface elemental mass analysis by a remote satellite or lunar rover.

  4. Improving plasma resistance and lowering roughness in an ArF photoresist by adding a chemical reaction inhibitor

    Energy Technology Data Exchange (ETDEWEB)

    Jinnai, Butsurin; Uesugi, Takuji; Koyama, Koji; Samukawa, Seiji [Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan); Kato, Keisuke; Yasuda, Atsushi; Maeda, Shinichi [Yokohama Research Laboratories, Mitsubishi Rayon Co., Ltd., 10-1 Daikoku-cho, Tsurumi-ku, Yokohama 230-0053 (Japan); Momose, Hikaru, E-mail: samukawa@ifs.tohoku.ac.j [Corporate Research Laboratories, Mitsubishi Rayon Co. Ltd., 2-1 Miyuki-cho, Otake, Hiroshima 739-0693 (Japan)

    2010-11-24

    Major challenges associated with 193 nm lithography using an ArF photoresist are low plasma resistance and roughness formation in the ArF photoresist during plasma processes. We have previously found decisive factors affecting the plasma resistance and roughness formation in an ArF photoresist: plasma resistance is determined by UV/VUV radiation, and roughness formation is dominated by chemical reactions. In this study, based on our findings on the interaction between plasma radiation species and ArF photoresist polymers, we proposed an ArF photoresist with a chemical reaction inhibitor, which can trap reactive species from the plasma, and characterized the performances of the resultant ArF photoresist through neutral beam experiments. Hindered amine light stabilizers, i.e. 4-hydroxy-2,2,6,6-tetramethyl-1-piperidinyloxy (HO-TEMPO), were used as the chemical reaction inhibitor. Etching rates of the ArF photoresist films were not dependent on the HO-TEMPO content in the irradiations without chemical reactions or under UV/VUV radiation. However, in the irradiation with chemical reactions, the etching rates of the ArF photoresist films decreased as the HO-TEMPO content increased. In addition, the surface roughness decreased with the increase in the additive amount of chemical reaction inhibitor. According to FTIR analysis, a chemical reaction inhibitor can inhibit the chemical reactions in ArF photoresist films through plasma radicals. These results indicate that a chemical reaction inhibitor is effective against chemical reactions, resulting in improved plasma resistance and less roughness in an ArF photoresist. These results also support our suggested mechanism of plasma resistance and roughness formation in an ArF photoresist.

  5. Informing the Human Plasma Protein Binding of Environmental Chemicals by Machine Learning in the Pharmaceutical Space: Applicability Domain and Limits of Predictability

    Science.gov (United States)

    The free fraction of a xenobiotic in plasma (Fub) is an important determinant of chemical adsorption, distribution, metabolism, elimination, and toxicity, yet experimental plasma protein binding data is scarce for environmentally relevant chemicals. The presented work explores th...

  6. Informing the Human Plasma Protein Binding of Environmental Chemicals by Machine Learning in the Pharmaceutical Space: Applicability Domain and Limits of Predictability

    Science.gov (United States)

    The free fraction of a xenobiotic in plasma (Fub) is an important determinant of chemical adsorption, distribution, metabolism, elimination, and toxicity, yet experimental plasma protein binding data is scarce for environmentally relevant chemicals. The presented work explores th...

  7. Nucleation rate of the quark-gluon plasma droplet at finite quark chemical potential

    Indian Academy of Sciences (India)

    D S Gosain; S Somorendro Singh; Agam K Jha

    2012-05-01

    The nucleation rate of quark-gluon plasma (QGP) droplet is computed at finite quark chemical potential. In the course of computing the nucleation rate, the finite size effects of the QGP droplet are taken into account. We consider the phenomenological flow parameter of quarks and gluons, which is dependent on quark chemical potential and we calculate the nucleation rate of the QGP droplet with this parameter. While calculating the nucleation rate, we find that for low values of quark phenomenological parameter $ q$, nucleation rate is negligible and when increases, nucleation rate increases significantly.

  8. Modelling chemical reactions in dc plasma inside oxygen bubbles in water

    Science.gov (United States)

    Takeuchi, N.; Ishii, Y.; Yasuoka, K.

    2012-02-01

    Plasmas generated inside oxygen bubbles in water have been developed for water purification. Zero-dimensional numerical simulations were used to investigate the chemical reactions in plasmas driven by dc voltage. The numerical and experimental results of the concentrations of hydrogen peroxide and ozone in the solution were compared with a discharge current between 1 and 7 mA. Upon increasing the water vapour concentration inside bubbles, we saw from the numerical results that the concentration of hydrogen peroxide increased with discharge current, whereas the concentration of ozone decreased. This finding agreed with the experimental results. With an increase in the discharge current, the heat flux from the plasma to the solution increased, and a large amount of water was probably vaporized into the bubbles.

  9. Plasma-enhanced chemical vapor deposition of amorphous Si on graphene

    Science.gov (United States)

    Lupina, G.; Strobel, C.; Dabrowski, J.; Lippert, G.; Kitzmann, J.; Krause, H. M.; Wenger, Ch.; Lukosius, M.; Wolff, A.; Albert, M.; Bartha, J. W.

    2016-05-01

    Plasma-enhanced chemical vapor deposition of thin a-Si:H layers on transferred large area graphene is investigated. Radio frequency (RF, 13.56 MHz) and very high frequency (VHF, 140 MHz) plasma processes are compared. Both methods provide conformal coating of graphene with Si layers as thin as 20 nm without any additional seed layer. The RF plasma process results in amorphization of the graphene layer. In contrast, the VHF process keeps the high crystalline quality of the graphene layer almost intact. Correlation analysis of Raman 2D and G band positions indicates that Si deposition induces reduction of the initial doping in graphene and an increase of compressive strain. Upon rapid thermal annealing, the amorphous Si layer undergoes dehydrogenation and transformation into a polycrystalline film, whereby a high crystalline quality of graphene is preserved.

  10. Whistler wave-induced ionospheric plasma turbulence: Source mechanisms and remote sensing

    Science.gov (United States)

    Pradipta, R.; Rooker, L. A.; Whitehurst, L. N.; Lee, M. C.; Ross, L. M.; Sulzer, M. P.; Gonzalez, S.; Tepley, C.; Aponte, N.; See, B. Z.; Hu, K. P.

    2013-10-01

    We report a series of experiments conducted at Arecibo Observatory in the past, aimed at the investigation of 40.75 kHz whistler wave interactions with ionospheric plasmas and the inner radiation belts at L=1.35. The whistler waves are launched from a Naval transmitter (code-named NAU) operating in Aguadilla, Puerto Rico at the frequency and power of 40.75 kHz and 100 kW, respectively. Arecibo radar, CADI, and optical instruments were used to monitor the background ionospheric conditions and detect the induced ionospheric plasma effects. Four-wave interaction processes produced by whistler waves in the ionosphere can excite lower hybrid waves, which can accelerate ionospheric electrons. Furthermore, whistler waves propagating into the magnetosphere can trigger precipitation of energetic electrons from the radiation belts. Radar and optical measurements can distinguish wave-wave and wave-particle interaction processes occurring at different altitudes. Electron acceleration by different mechanisms can be verified from the radar measurements of plasma lines. To facilitate the coupling of NAU-launched 40.75 kHz whistler waves into the ionosphere, we can rely on naturally occurring spread F irregularities to serve as ionospheric ducts. We can also use HF wave-created ducts/artificial waveguides, as demonstrated in our earlier Arecibo experiments and recent Gakona experiments at HAARP. The newly constructed Arecibo HF heater will be employed in our future experiments, which can extend the study of whistler wave interactions with the ionosphere and the magnetosphere/radiation belts as well as the whistler wave conjugate propagation between Arecibo and Puerto Madryn, Argentina.

  11. Plasma-Enhanced Chemical Vapor Deposition as a Method for the Deposition of Peptide Nanotubes

    Science.gov (United States)

    2013-09-17

    peptide nanotubes, plasma-enhanced chemical vapor deposition, nano assembly 16. SECURITY CLASSIFICATION OF: 17. LIMITATION OF ABSTRACT SAR 18...Using physical vapor deposition ( PVD ) well-ordered assemblies of peptide nanotubes (PNTs) composed of dipeptide subunits are obtained on various...for the deposition of thin films (Figure 1b). A. B. Figure 1. (a) Illustration of physical vapor deposition ( PVD ) process of diphenylalanine

  12. Growth of Aligned Carbon Nanotubes through Microwave Plasma Chemical Vapor Deposition

    Institute of Scientific and Technical Information of China (English)

    王升高; 汪建华; 马志斌; 王传新; 满卫东

    2005-01-01

    Aligned carbon nanotubes (CNTs) were synthesized on glass by microwave plasma chemical vapor deposition (MWPCVD) with a mixture of methane and hydrogen gases at the low temperature of 550 ℃. The experimental results show that both the self-bias potential and the density of the catalyst particles are responsible for the alignment of CNTs. When the catalyst particle density is high enough, strong interactions among the CNTs can inhibit CNTs from growing randomly and result in parallel alignment.

  13. Behavior of incorporated nitrogen in plasma-nitrided silicon oxide formed by chemical vapor deposition

    Science.gov (United States)

    Shinoda, Nao; Itokawa, Hiroshi; Fujitsuka, Ryota; Sekine, Katsuyuki; Onoue, Seiji; Tonotani, Junichi

    2016-04-01

    The behavior of nitrogen (N) atoms in plasma-nitrided silicon oxide (SiO2) formed by chemical vapor deposition (CVD) was characterized by physical analysis and from electrical properties. The changes in the chemical bonding and distribution of N in plasma-nitrided SiO2 were investigated for different subsequent processes. N-Si3, N-Si2O, and N2 are formed in a SiO2 film by plasma nitridation. N2 molecules diffuse out during annealing at temperatures higher than 900 °C. NH species are generated from N2 molecules and H in the SiO2 film with subsequent oxide deposition using O3 as an oxidant. The capacitance-voltage (C-V) curves of metal-oxide-semiconductor (MOS) capacitors are obtained. The negative shift of the C-V curve is caused by the increase in the density of positive fix charge traps in CVD-SiO2 induced by plasma nitridation. The C-V curve of plasma-nitrided SiO2 subjected to annealing shifts to the positive direction and that subjected to the subsequent oxide deposition shifts markedly to the negative direction. It is clarified that the density of positive charge fixed traps in plasma-nitrided SiO2 films decrease because the amount of N2 molecules is decreased by annealing, and that the density of traps increases because NH species are generated and move to the interface between SiO2 and the Si substrate with the subsequent oxide deposition.

  14. Morphological stability of the atomically clean surface of silicon (100) crystals after microwave plasma-chemical processing

    Energy Technology Data Exchange (ETDEWEB)

    Yafarov, R. K., E-mail: pirpc@yandex.ru; Shanygin, V. Ya. [Russian Academy of Sciences, Saratov Branch of the Kotel’nikov Institute of Radio Engineering and Electronics (Russian Federation)

    2016-01-15

    The morphological stability of atomically clean silicon (100) surface after low-energy microwave plasma-chemical etching in various plasma-forming media is studied. It is found that relaxation changes in the surface density and atomic bump heights after plasma processing in inert and chemically active media are multidirectional in character. After processing in a freon-14 medium, the free energy is minimized due to a decrease in the surface density of microbumps and an increase in their height. After argon-plasma processing, an insignificant increase in the bump density with a simultaneous decrease in bump heights is observed. The physicochemical processes causing these changes are considered.

  15. Improved GFR and renal plasma perfusion following remote ischaemic conditioning in a porcine kidney transplantation model

    DEFF Research Database (Denmark)

    Krogstrup, Nicoline V; Soendergaard, Peter; Secher, Niels G

    2012-01-01

    systemic protection against ischaemic injuries. Using a porcine kidney transplantation model with donor (63 kg) recipient (15 kg) size mismatch, we investigated the effects of recipient rIC on early renal plasma perfusion and GFR. Brain death was induced in donor pigs (n = 8) and kidneys were removed...... and kept in cold storage until transplantation. Nephrectomized recipient pigs were randomized to rIC (n = 8) or non-rIC (n = 8) with one kidney from the same donor in each group. rIC consisted of 4 × 5 min clamping of the abdominal aorta. GFR was significantly higher in the rIC group compared with non......-rIC (7.2 ml/min vs. 3.4 ml/min; ΔGFR = 3.7 ml/min, 95%-CI: 0.3-7.2 ml/min, P = 0.038). Renal plasma perfusion in both cortex and medulla measured by dynamic contrast-enhanced magnetic resonance imaging (MRI) was significantly higher over time in the rIC group compared with non-rIC. This experimental...

  16. Dry-plasma-free chemical etch technique for variability reduction in multi-patterning (Conference Presentation)

    Science.gov (United States)

    Kal, Subhadeep; Mohanty, Nihar; Farrell, Richard A.; Franke, Elliott; Raley, Angelique; Thibaut, Sophie; Pereira, Cheryl; Pillai, Karthik; Ko, Akiteru; Mosden, Aelan; Biolsi, Peter

    2017-04-01

    Scaling beyond the 7nm technology node demands significant control over the variability down to a few angstroms, in order to achieve reasonable yield. For example, to meet the current scaling targets it is highly desirable to achieve sub 30nm pitch line/space features at back-end of the line (BEOL) or front end of line (FEOL); uniform and precise contact/hole patterning at middle of line (MOL). One of the quintessential requirements for such precise and possibly self-aligned patterning strategies is superior etch selectivity between the target films while other masks/films are exposed. The need to achieve high etch selectivity becomes more evident for unit process development at MOL and BEOL, as a result of low density films choices (compared to FEOL film choices) due to lower temperature budget. Low etch selectivity with conventional plasma and wet chemical etch techniques, causes significant gouging (un-intended etching of etch stop layer, as shown in Fig 1), high line edge roughness (LER)/line width roughness (LWR), non-uniformity, etc. In certain circumstances this may lead to added downstream process stochastics. Furthermore, conventional plasma etches may also have the added disadvantage of plasma VUV damage and corner rounding (Fig. 1). Finally, the above mentioned factors can potentially compromise edge placement error (EPE) and/or yield. Therefore a process flow enabled with extremely high selective etches inherent to film properties and/or etch chemistries is a significant advantage. To improve this etch selectivity for certain etch steps during a process flow, we have to implement alternate highly selective, plasma free techniques in conjunction with conventional plasma etches (Fig 2.). In this article, we will present our plasma free, chemical gas phase etch technique using chemistries that have high selectivity towards a spectrum of films owing to the reaction mechanism ( as shown Fig 1). Gas phase etches also help eliminate plasma damage to the

  17. Investigating chlorophyll and nitrogen levels of mangroves at Al-Khor, Qatar: an integrated chemical analysis and remote sensing approach.

    Science.gov (United States)

    Al-Naimi, Noora; Al-Ghouti, Mohammad A; Balakrishnan, Perumal

    2016-05-01

    Mangroves are unique ecosystems that dominate tropical and subtropical coastlines around the world. They provide shelter and nursery to wide variety of species such as fish and birds. Around 73 species of mangroves were recognized around the world. In Qatar, there is only one mangrove species Avicennia marina that is predominant along the northeastern coast. Assessing the health of these valuable ecosystems is vital for protection, management, and conservation of those resources. In this study, an integrated approach of chemical and remote sensing analysis was implemented to investigate the current status of the mangrove trees in Al-Khor, Qatar. Fifteen different A. marina trees from different locations in the mangrove forest were examined for their chlorophyll and nitrogen content levels. Soil analysis was also conducted to understand the effect of moisture on nitrogen availability. Results shows that currently, mangroves are in a good status in terms of nitrogen availability and chlorophyll levels which are related and both are key factors for photosynthesis. Remote sensing techniques were used for chlorophyll prediction. The results showed that these methods have the potential to be used for chlorophyll prediction and estimation.

  18. Experimental Verification on Remote Detectability of Concealed Radioactive Material Based on the Plasma Discharge Delay Time using High-Power Millimeter-Wave

    Science.gov (United States)

    Kim, Dongsung; Yu, Dongho; Sawant, Ashwini; Choe, Mun Seok; Lee, Ingeun; Choi, Eunmi

    2016-10-01

    We experimentally demonstrate a remote detection method of a radioactive source by plasma breakdown using high-power millimeter-wave source, gyrotron. A number of free electrons near the radioactive source are much higher than those of without the radioactive source (roughly 10 particles/cm3) owing to the interaction of air molecules and strong gamma rays generated by radioactive material. The RF wave beam is focused in ambient air, and the plasmas discharge occurs involving random delay time which means a time interval between the RF wave and a fluorescent light caused by the plasma. We observed that the delay time decreased significantly due to the high density of free electrons in Ar plasma with an existence of Co60 radioactive material. This technique of delay time measurement shows 1000 times more sensitive than a method of detectable mass equation to identify the existence of radioactive source remotely. It is the first experimental verification of radioactive material detection using a high power gyrotron. This study shows that a remote detection of radioactive material based on analysis of precise delay time measurement could be feasible by using a high power millimeter/THz wave gyrotron. NRF-2013R1A1A2061062, NRF-2012-Global Ph.D. Fellowship Program.

  19. Research of Hollow Cathode Remote Plasma Polymerization on Surface of Secondary Battery Separator%电池隔膜表面空心阴极等离子体接枝聚合研究

    Institute of Scientific and Technical Information of China (English)

    温贻芳; 陈新; 芮延年; 王红卫

    2012-01-01

    The surface of non-woven polypropylene secondary battery separator was modified by hollow cathode remote plasma polymerizatioa The polymerization mechanism was analyzed, and the effects of working parameters (such as discharge power, working gas flow rate, sample position etc. ) on the polymerization rate were studied systematically. The IR and SEM were used to analyze the chemical composition and the surface morphology. The results show that the hydrophilic group was imported on the surface of polypropylene after hollow cathode remote plasma modification, so that the wettability of the non-woven polypropylene secondary battery separator was greatly improved.%应用自制的空心阴极等离子体装置,引发丙烯酸在丙纶表面的接枝聚合,研究了等离子体接枝聚合作用机理,分析了等离子体接枝聚合各参数(放电功率、气体流量、丙烯酸蒸气流量、样品位置等)对聚合速率的影响.通过红外光谱、扫描电镜等对丙纶接枝聚合膜表面的化学组成和形态结构等进行了表征分析,证明了亲水基团的引入,改善了丙纶隔膜的亲水性能.

  20. Beyond potentiometry: robust electrochemical ion sensor concepts in view of remote chemical sensing.

    Science.gov (United States)

    Bakker, Eric; Bhakthavatsalam, Vishnupriya; Gemene, Kebede L

    2008-05-15

    For about 100 years, potentiometry with ion-selective electrodes has been one of the dominating electroanalytical techniques. While great advances in terms of selective chemistries and materials have been achieved in recent years, the basic manner in which ion-selective membranes are used has not fundamentally changed. The potential readings are directly co-dependent on the potential at the reference electrode, which requires maintenance and for which very few accepted alternatives have been proposed. Fouling or clogging of the exposed electrode surfaces will lead to changes in the observed potential. At the same time, the Nernst equation predicts quite small potential changes, on the order of millivolts for concentration changes on the order of a factor two, making frequent recalibration, accurate temperature control and electrode maintenance key requirements of routine analytical measurements. While the relatively advanced selective materials developed for ion-selective sensors would be highly attractive for low power remote sensing application, one should consider solutions beyond classical potentiometry to make this technology practically feasible. This paper evaluates some recent examples that may be attractive solutions to the stated problems that face potentiometric measurements. These include high-amplitude sensing approaches, with sensitivities that are an order of magnitude larger than predicted by the Nernst equation; backside calibration potentiometry, where knowledge of the magnitude of the potential is irrelevant and the system is evaluated from the backside of the membrane; controlled current coulometry with ion-selective membranes, an attractive technique for calibration-free reagent delivery without the need for standards or volumetry; localized electrochemical titrations at ion-selective membranes, making it possible to design sensors that directly monitor parameters such as total acidity for which volumetric techniques were traditionally used

  1. Minimally-Invasive Gene Transfection by Chemical and Physical Interaction of Atmospheric Pressure Plasma Flow

    Science.gov (United States)

    Kaneko, Toshiro

    2014-10-01

    Non-equilibrium atmospheric pressure plasma irradiated to the living-cell is investigated for medical applications such as gene transfection, which is expected to play an important role in molecular biology, gene therapy, and creation of induced pluripotent stem (iPS) cells. However, the conventional gene transfection using the plasma has some problems that the cell viability is low and the genes cannot be transferred into some specific lipid cells, which is attributed to the unknown mechanism of the gene transfection using the plasma. Therefore, the time-controlled atmospheric pressure plasma flow is generated and irradiated to the living-cell suspended solution for clarifying the transfection mechanism toward developing highly-efficient and minimally- invasive gene transfection system. In this experiment, fluorescent dye YOYO-1 is used as the simulated gene and LIVE/DEAD Stain is simultaneously used for cell viability assay. By the fluorescence image, the transfection efficiency is calculated as the ratio of the number of transferred and surviving cells to total cell count. It is clarified that the transfection efficiency is significantly increased by the short-time (cell viability (>90%). This result indicates that the physical effects such as the electric field caused by the charged particles arriving at the surface of the cell membrane, and chemical effects associated with plasma-activated products in solution act synergistically to enhance the cell-membrane transport with low-damage. This work was supported by JSPS KAKENHI Grant Number 24108004.

  2. Controlled chemical and morphological surface modifications via pulsed plasma polymerizations: Synthesis of ultrahydrophobic surfaces

    Science.gov (United States)

    Qiu, Haibo

    The RF plasma polymerization of saturated linear and cyclic perfluoroalkane monomers and vinyl acetic acid were studied in this dissertation. Film chemical compositions, deposition rates, surface wettabilities and morphologies were characterized as functions of various plasma processing conditions. Large progressive changes in chemical compositions with sequential variations in plasma duty cycle were demonstrated in polymerization of both perfluoroalkane and vinyl acetic acid monomers. As anticipated, polymer films obtained from the perfluorocarbon monomers exhibited a general trend towards more linear structures with decreasing plasma duty cycles. However, completely unexpectedly, ultrahydrophobic films were obtained from some of these monomers under restricted duty cycle and power input conditions. SEM and XPS characterizations revealed that a rough, fibrous-like surface morphology is responsible for this ultrahydrophobicity, as opposed to unusual chemical compositions. The growth of the fibrous surface is believed to arise from nucleation and hillock-like growth patterns on selectively activated sites of the growing polymer film. Surface mobility of plasma generated reactive species apparently plays an important role in the growth of the fibrous ultrahydrophobic surfaces, as shown by substrate temperature studies. Additionally, the present study revealed a number of interesting new observations of significant differences in the chemical compositions and deposition rates of polymer films obtained from the diverse range of perfluorocarbon monomers employed in this work. The ultrahydrophobic fluorocarbon films discovered in this investigation were evaluated for use in several biomaterial applications. The results obtained show excellent marine antifouling properties for these surfaces, as documented in ocean testing experiments. These surfaces have also been shown to be useful in controlling protein and peptide surface adsorptions, as well as in the inflammatory

  3. REMOTE SENSING DAMAGE ASSESSMENT OF CHEMICAL PLANTS AND REFINERIES FOLLOWING HURRICANES KATRINA AND RITA

    Science.gov (United States)

    The massive destruction brought by Hurricanes Katrina and Rita also impacted the many chemical plants and refineries in the region. The achievement of this rapid analysis capability highlights the advancement of this technology for air quality assessment and monitoring. Case st...

  4. Dileptons from a Chemically Equilibrating Quark-Gluon Plasma at Finite Baryon Density

    Institute of Scientific and Technical Information of China (English)

    GUAN Na-Na; HE Ze-Jun; LONG Jia-Li; CAI Xiang-Zhou

    2008-01-01

    We perform a complete calculation for the delepton production from the processes q(q-) →l(l-), Compton-like (qg→ql(l-),(q-)g→ql(l-)), q(q-)→gl(l-), gluon fusion g(g-)→c(c-), annihilation q(q-)→c(c-) as well as multiple scattering of quarks in a chemically equilibrating quark-gluon plasma system at finite baryon density. It is found that quark-antiquark annihilation,Compton-like, gluon fusion and multiple scattering of quarks give important contribution. Moreover, the increase of the quark phase life-time with increasing initial quark chemical potential makes the dilepton yield as an increasing function of the initial quark chemical potential.

  5. Continuous ice-core chemical analyses using inductively coupled plasma mass spectrometry.

    Science.gov (United States)

    McConnell, Joseph R; Lamorey, Gregg W; Lambert, Steven W; Taylor, Kendrick C

    2002-01-01

    Impurities trapped in ice sheets and glaciers have the potential to provide detailed, high temporal resolution proxy information on paleo-environments, atmospheric circulation, and environmental pollution through the use of chemical, isotopic, and elemental tracers. We present a novel approach to ice-core chemical analyses in which an ice-core melter is coupled directly with both an inductively coupled plasma mass spectrometer and a traditional continuous flow analysis system. We demonstrate this new approach using replicated measurements of ice-core samples from Summit, Greenland. With this method, it is possible to readily obtain continuous, exactly coregistered concentration records for a large number of elements and chemical species at ppb and ppt levels and at unprecedented depth resolution. Such very-high depth resolution, multiparameter measurements will significantly expand the use of ice-core records for environmental proxies.

  6. Decomposition treatment of SO2F2 using packed bed DBD plasma followed by chemical absorption.

    Science.gov (United States)

    Nie, Yong; Zheng, Qifeng; Liang, Xiaojiang; Gu, Dayong; Lu, Meizhen; Min, Min; Ji, Jianbing

    2013-07-16

    The technology of packed bed dielectric barrier discharge (DBD) plasma followed by a chemical absorption has been developed and was found to be an efficient way for decomposition treatment of sulfuryl fluoride (SO2F2) in simulated residual fumigant. The effects of energy density, initial SO2F2 concentration, and residence time on the removal efficiency of SO2F2 for the DBD plasma treatment alone were investigated. It was found that the SO2F2 could be removed completely when initial volume concentration, energy density, and residence time were 0.5%, 33.9 kJ/L, and 5.1 s, respectively. The removal mechanism of SO2F2 in the packed bed DBD reactor was discussed. Based on the detailed analysis of SO2F2 molecular stability and its exhaust products in the DBD plasma reactor, it was concluded that the energetic electrons generated in the packed bed DBD reactor played a key role on the removal of SO2F2, and the major decomposition products of SO2F2 detected were SO2, SiF4, and S (Sulfur). Among these products, SiF4 was formed by the F atom reacted with the filler-quartz glass beads (SiO2) in the packed bed DBD reactor. Aqueous NaOH solution was used as the chemical absorbent for the gaseous products of SO2F2 after plasma pretreatment. It was found that the gaseous products in the plasma exhaust could be absorbed and fixed by the subsequent aqueous NaOH solution.

  7. A Chemical Stability Study of Trimethylsilane Plasma Nanocoatings for Coronary Stents

    Science.gov (United States)

    Jones, John Eric; Yu, Qingsong; Chen, Meng

    2016-01-01

    In this study, trimethylsilane (TMS) plasma nanocoatings were deposited onto 316L stainless steel coupons in direct current (DC) and radio frequency (RF) glow discharges and additional NH3/O2 plasma treatment to tailor the coating surface properties. The chemical stability of the plasma nanocoatings were evaluated after 12 week (~3 month) storage under dry condition (25 °C) and immersion in simulated body fluid (SBF) at 37 °C. It was found that nanocoatings did not impact surface roughness of underlying stainless steel substrates. X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR) were used to characterize surface chemistry and compositions. Both DC and RF TMS plasma nanocoatings had Si– and C– rich composition; and the O– and N– contents on the surfaces were substantially increased after NH3/O2 plasma treatment. Contact angle measurements showed that DC TMS nanocoating with NH3/O2 treatment generated very hydrophilic surfaces. DC TMS nanocoatings with NH3/O2 treatment showed minimal surface chemistry change after 12 week immersion in SBF. However, nitrogen functionalities on RF-TMS coating with NH3/O2 post treatment were not as stable as in DC case. Cell culture studies revealed that the surfaces with DC coating and NH3/O2 post treatment demonstrated substantially improved proliferation of endothelial cells over the 12 week storage period at both dry and wet conditions, as compared to other coated surfaces. Therefore, DC nanocoatings with NH3/O2 post treatment may be chemically stable for long-term properties, including shelf-life storage and exposure to the bloodstream for coronary stent applications. PMID:27712432

  8. Exploring the potential of remote plasma sputtering for the production of L10 ordered FePt thin films

    Science.gov (United States)

    Zygridou, S.; Barton, C. W.; Nutter, P. W.; Thomson, T.

    2017-07-01

    Lowering the temperature at which the desirable L10 phase forms in FePt thin films is a key requirement in the development of next generation high-density data storage media and spintronic devices. Remote plasma sputtering offers a higher degree of control over the sputtering parameters, allowing the properties of films to be tailored, and potentially can affect the ordering kinetics of the L10 phase of FePt. Here, we report a comprehensive study of FePt thin films deposited under a range of temperatures and sputtering conditions. X-ray diffraction and magnetometry investigations show that whilst FePt thin films ordered in the L10 phase with high perpendicular anisotropy can be produced using this technique, there is no significant reduction in the required ordering temperature compared with films produced using conventional DC sputtering. Optimally ordered L10 FePt films were fabricated when the film was deposited at a substrate temperature of 200 °C, followed by post annealing at 750 °C.

  9. Toxicity challenges in environmental chemicals: Prediction of human plasma protein binding through quantitative structure-activity relationship (QSAR) models

    Science.gov (United States)

    The present study explores the merit of utilizing available pharmaceutical data to construct a quantitative structure-activity relationship (QSAR) for prediction of the fraction of a chemical unbound to plasma protein (Fub) in environmentally relevant compounds. Independent model...

  10. Application and state of development for remote chemical sensors in environmental monitoring: A literature review

    Energy Technology Data Exchange (ETDEWEB)

    Schabron, J.F.; Niss, N.D.; Hart, B.K.

    1991-09-01

    A study was performed on chemical sensor technology currently available and under development. The information was compiled into a format wherein information on the sensors is listed in a comparable manner. An introductory section is provided to illustrate the regulatory environment in which such sensor technology will be used. This information should allow corporations or federal agencies ready access to useful information for the potential licensing of sensor technology for commercial development or specific environmental monitoring operations. Although every attempt was made to identify as many chemical sensors as possible, we recognize that some may be missed inadvertently. The accuracy of the information provided by the various sources regarding the state of development for the various sensors was not verified. Judgments or opinions regarding the actual state of development or utility of these devices are not included in this report. However, we feel that this report accurately reflects the state of the art at the present time.

  11. Application and state of development for remote chemical sensors in environmental monitoring: A literature review

    Energy Technology Data Exchange (ETDEWEB)

    Schabron, J.F.; Niss, N.D.; Hart, B.K.

    1991-09-01

    A study was performed on chemical sensor technology currently available and under development. The information was compiled into a format wherein information on the sensors is listed in a comparable manner. As introductory section is provided to illustrate the regulatory environment in which such sensor technology will be used. This information should allow corporations or federal agencies ready access to useful information for the potential licensing of sensor technology for commercial development or specific environmental monitoring operations. Although every attempt was made to identify as many chemical sensors as possible, we recognize that some may be missed inadvertently. The accuracy of the information provided by the various sources regarding the state of development for the various sensors was not verified. Judgments or opinions regarding the actual state of development or utility of these devices are not included in this report. However, we feel that this report accurately reflects the state of the art at the present time.

  12. Application and state of development for remote chemical sensors in environmental monitoring: A literature review

    Energy Technology Data Exchange (ETDEWEB)

    Schabron, J.F.; Niss, N.D.; Hart, B.K.

    1991-09-01

    A study was performed on chemical sensor technology currently available and under development. The information was compiled into a format wherein information on the sensors is listed in a comparable manner. An introductory section is provided to illustrate the regulatory environment in which such sensor technology will be used. This information should allow corporations or federal agencies ready access to useful information for the potential licensing of sensor technology for commercial development or specific environmental monitoring operations. Although every attempt was made to identify as many chemical sensors as possible, we recognize that some may be missed inadvertently. The accuracy of the information provided by the various sources regarding the state of development for the various sensors was not verified. Judgments or opinions regarding the actual state of development or utility of these devices are not included in this report. However, we feel that this report accurately reflects the state of the art at the present time.

  13. Application and state of development for remote chemical sensors in environmental monitoring: A literature review

    Energy Technology Data Exchange (ETDEWEB)

    Schabron, J.F.; Niss, N.D.; Hart, B.K.

    1991-09-01

    A study was performed on chemical sensor technology currently available and under development. The information was compiled into a format wherein information on the sensors is listed in a comparable manner. As introductory section is provided to illustrate the regulatory environment in which such sensor technology will be used. This information should allow corporations or federal agencies ready access to useful information for the potential licensing of sensor technology for commercial development or specific environmental monitoring operations. Although every attempt was made to identify as many chemical sensors as possible, we recognize that some may be missed inadvertently. The accuracy of the information provided by the various sources regarding the state of development for the various sensors was not verified. Judgments or opinions regarding the actual state of development or utility of these devices are not included in this report. However, we feel that this report accurately reflects the state of the art at the present time.

  14. STUDENT AWARD FINALIST: Plasma Acid: A Chemically and Physically Metastable Substance

    Science.gov (United States)

    Shainsky, Natalie; Dobrynin, Danil; Ercan, Utku; Joshi, Suresh; Brooks, Ari; Ji, Haifeng; Fridman, Gregory; Cho, Young; Fridman, Alexander; Friedman, Gennady

    2011-10-01

    Non-thermal atmospheric pressure dielectric barrier discharge applied to the surface of a liquid creates a chemically and physically metastable substance. The properties and lifetime of the substance depend on the treatment conditions such as gas atmosphere and liquid medium used, treatment dose, and other parameters. When deionized water is used, the metastable substance becomes a strong oxidizer. We show that direct exposure of deionized water to neutral and charged species produced in plasma creates a strong oxidizer and acidic substance in this water which, for the lack of a better term, we termed plasma acid. Plasma acid can remain stable for relatively long time and its oxidizing power may be linked to the significant lowering of its pH. We report experiments that demonstrate plasma acid's metastability. We also show that observed pH of as low as 2.0 cannot be completely accounted for by the production of nitric acid; and that the conjugate base derived from superoxide is at least partly responsible for both, lowering of the pH and increase in the oxidizing power of the solution.

  15. Plasma-chemical simulation of negative corona near the inception voltage

    Science.gov (United States)

    Pontiga, Francisco; Duran-Olivencia, Francisco J.; Castellanos, Antonio

    2013-09-01

    The spatiotemporal development of Trichel pulses in oxygen between a spherical electrode and a grounded plane has been simulated using a fluid approximation that incorporates the plasma chemistry of the electrical discharge. Elementary plasma processes, such as ionization, electron attachment, electron detachment, recombination between ions and chemical reactions between neutral species, are all included in a chemical model consisting of 55 reactions between 8 different species (electrons, O2+,O2-,O3-,O-, O2, O, O3). Secondary emission at the cathode by the impact of positive ions and photons is also considered. The spatial distribution of species is computed in three dimensions (2D-axysimmetrical) by solving Poisson's equation for the electric field and the continuity equations for the species, with the inclusion of the chemical gain/loss rate due to the particle interaction. The results of the simulation reveal the interplay between the different negative ions during the development of every Trichel pulse, and the rate of production of atomic oxygen and ozone by the corona discharge. This work was supported by the Consejeria de Innovacion, Ciencia y Empresa (Junta de Andalucia) and by the Ministerio de Ciencia e Innovacion, Spain, within the European Regional Development Fund contracts FQM-4983 and FIS2011-25161.

  16. Impact of Seminal Chemical Elements on the Oxidative Balance in Bovine Seminal Plasma and Spermatozoa.

    Science.gov (United States)

    Tvrdá, Eva; Lukáč, Norbert; Schneidgenová, Monika; Lukáčová, Jana; Szabó, Csaba; Goc, Zofia; Greń, Agnieszka; Massányi, Peter

    2013-01-01

    Mutual relationships between selected chemical elements (Na, K, Fe, Cu, Mg, and Zn), basic motility characteristics (motility and progressive motility), and markers of the oxidative balance (superoxide dismutase, catalase, glutathione, albumin, and malondialdehyde) were investigated in bovine seminal plasma and spermatozoa. Computer assisted sperm analysis was used to assess the motility parameters; mineral concentrations were determined by the voltammetric method and flame absorption spectrophotometry; antioxidants and malondialdehyde were evaluated by UV/VIS spectrophotometry. Concentrations of chemical elements in both seminal fractions were in the following descending order: Na > K > Zn > Mg > Fe > Cu. Higher amounts of all minerals and nonenzymatic antioxidants were detected in the seminal plasma (P Zn were positively correlated with the motility and antioxidant parameters (P < 0.05; P < 0.01; P < 0.001). Inversely, K exhibited the positive associations with malondialdehyde (P < 0.05). This study demonstrates that most chemical elements are integral components of bovine semen and are needed for the protection against oxidative stress development.

  17. Impact of Seminal Chemical Elements on the Oxidative Balance in Bovine Seminal Plasma and Spermatozoa

    Directory of Open Access Journals (Sweden)

    Eva Tvrdá

    2013-01-01

    Full Text Available Mutual relationships between selected chemical elements (Na, K, Fe, Cu, Mg, and Zn, basic motility characteristics (motility and progressive motility, and markers of the oxidative balance (superoxide dismutase, catalase, glutathione, albumin, and malondialdehyde were investigated in bovine seminal plasma and spermatozoa. Computer assisted sperm analysis was used to assess the motility parameters; mineral concentrations were determined by the voltammetric method and flame absorption spectrophotometry; antioxidants and malondialdehyde were evaluated by UV/VIS spectrophotometry. Concentrations of chemical elements in both seminal fractions were in the following descending order: Na > K > Zn > Mg > Fe > Cu. Higher amounts of all minerals and nonenzymatic antioxidants were detected in the seminal plasma (P<0.01; P<0.001, while higher MDA concentration and activity of enzymatic antioxidants were recorded in the cell lysates (P<0.01; P<0.001. Na, Fe, Cu, Mg, and Zn were positively correlated with the motility and antioxidant parameters (P<0.05; P<0.01; P<0.001. Inversely, K exhibited the positive associations with malondialdehyde (P<0.05. This study demonstrates that most chemical elements are integral components of bovine semen and are needed for the protection against oxidative stress development.

  18. Pulsed plasma chemical synthesis of SixCyOz composite nanopowder

    Science.gov (United States)

    Kholodnaya, G.; Sazonov, R.; Ponomarev, D.; Remnev, G.

    2017-05-01

    SixCyOz composite nanopowder with an average size of particles about 10-50 nm was produced using the pulsed plasma chemical method. The experiments on the synthesis of nanosized composite were carried out using a TEA-500 pulsed electron accelerator. To produce a composite, SiCl4, O2, and CH4 were used. The major part of experiments was conducted using a plasma chemical reactor (quartz, 140 mm diameter, 6 l volume). The initial reagents were injected into the reactor, then a pulsed electron beam was injected which initiated the chemical reactions whose products were the SixCyOz composite nanopowder. To define the morphology of the particles, the JEOL-II-100 transmission electron microscope (TEM) with an accelerating voltage of 100 kV was used. The substances in the composition of the composite nanopowder were identified using the infrared absorption optical spectrum. To conduct this analysis, the Nicolet 5700 FT-IR spectrometer was used.

  19. Plasma Assisted Chemical Vapour Deposition – Technological Design Of Functional Coatings

    Directory of Open Access Journals (Sweden)

    Januś M.

    2015-06-01

    Full Text Available Plasma Assisted Chemical Vapour Deposition (PA CVD method allows to deposit of homogeneous, well-adhesive coatings at lower temperature on different substrates. Plasmochemical treatment significantly impacts on physicochemical parameters of modified surfaces. In this study we present the overview of the possibilities of plasma processes for the deposition of diamond-like carbon coatings doped Si and/or N atoms on the Ti Grade2, aluminum-zinc alloy and polyetherketone substrate. Depending on the type of modified substrate had improved the corrosion properties including biocompatibility of titanium surface, increase of surface hardness with deposition of good adhesion and fine-grained coatings (in the case of Al-Zn alloy and improving of the wear resistance (in the case of PEEK substrate.

  20. Cylindrical dielectric barrier discharge plasma catalytic effect on chemical methods of silver nano-particle production

    Science.gov (United States)

    Bahrami, Zahra; Khani, Mohammad Reza; Shokri, Babak

    2016-11-01

    In this study, cylindrical dielectric barrier discharge plasma was used to study the catalytic effect on chemical methods of silver nano-particles for the first time. In this method, the processing time is short and the temperature of reaction is low. Also, the reactor is very simple, inexpensive, and accessible. In this work, pure AgNO3 as the precursor agent and poly vinyl pyrrolidone as the macromolecular surfactant were dissolved in ethanol as the solvent. UV-Vis and XRD were used to identify the colloidal and powder nano-particles, respectively. Optical emission spectroscopy was also used to identify the active species in plasma. Effects of gas flow rate, voltage, volume of solution, and processing time were also studied. Moreover, TEM and SEM images presented the mean diameter of nano-particle size around 10 to 20 nm. The results have been very promising.

  1. Hydrogen Plasma Durability of Chemically Treated SnO2 Thin Films

    Science.gov (United States)

    Kawabata, Keishi; Tanaka, Takeshi; Hirose, Masataka

    1993-10-01

    The chemical stability of SnO2 surfaces against hydrogen plasma exposure has been studied by treating a SnO2/glass system either in steam at a substrate temperature of 200 and 400°C or in ethyl alcohol at 200 and 400°C, or by fluorinating the surface at 400°C in an NF3+O2 gas mixture. Also, an electroplated Zn layer on SnO2 has been oxidized at 400°C. X-ray photoelectron spectroscopy of such surfaces has revealed that the reduction reaction of the SnO2 surface exposed to hydrogen plasma is dramatically suppressed by the steam treatment at 400°C.

  2. Deposition of electrochromic tungsten oxide thin films by plasma-enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Henley, W.B.; Sacks, G.J. [Univ. of South Florida, Tampa, FL (United States). Center of Microelectronics

    1997-03-01

    Use of plasma-enhanced chemical vapor deposition (PECVD) for electrochromic WO{sub 3} film deposition is investigated. Oxygen, hydrogen, and tungsten hexafluoride were used as source gases. Reactant gas flow was investigated to determine the effect on film characteristics. High quality optical films were obtained at deposition rates on the order of 100 {angstrom}/s. Higher deposition rates were attainable but film quality and optical coherence degraded. Atomic emission spectroscopy (AES), was used to provide an in situ assessment of the plasma deposition chemistry. Through AES, it is shown that the hydrogen gas flow is essential to the deposition of the WO{sub 3} film. Oxygen gas flow and tungsten hexafluoride gas flow must be approximately equal for high quality films.

  3. Holographic dual of a boost-invariant plasma with chemical potential

    Energy Technology Data Exchange (ETDEWEB)

    Kalaydzhyan, Tigran; Kirsch, Ingo

    2010-12-15

    We construct a gravity dual of a boost-invariant flow of an N=4 SU(N) supersymmetric Yang-Mills gauge theory plasma with chemical potential. We present both a first-order corrected late-time solution in Eddington-Finkelstein coordinates and a zeroth-order solution in parametric form in Fefferman-Graham coordinates. The resulting background takes the form of a time-dependent AdS Reissner-Nordstroem-type black hole whose horizons move into the bulk of the AdS space. The solution correctly reproduces the energy and charge density as well as the viscosity of the plasma previously computed in the literature. (orig.)

  4. Plasma-chemical treatment of industrial wastewaters from brewery “Brasseries du Cameroun”, Bafoussam factory

    Directory of Open Access Journals (Sweden)

    Estella T. Njoyim

    2016-01-01

    Full Text Available This work focuses on the study of the chemical reactivity of an advanced oxidation process (AOP, called the plasma technique, in order to prevent industrial effluent from pollution and better cope to several damage of environment. The oxidizing and acidifying properties of an electric discharge of the gliding arc plasma and its application to a target which is a real effluent (wastewater from Brasseries du Cameroun -Bafoussam plant fascinated this study. Samples were collected from the central collecting point (CCP of the effluent. The collected effluent samples were analyzed by volumetric and instrumental methods, and then exposed to the gliding discharge during specific time periods of 3-60 min to exhibit the desired decontamination effects. At the end of 60 min of exposure time to the discharge, 52.22% and 50.19% obtained respectively to abatement of turbidity and rate of fall in absorbance. This reduction can be explained by the fact that the coloured compounds were degraded and this degradation gave rise to the transparent appearance observed. After stopping the discharge process, the abatement percentage of BOD5, COD and TOC, were obtained at the same time (60min with values of 52.05%, 68.63% and 69.37% respectively. These results reflect the considerable reduction of the pollution load of the wastewaters collected from CCP of the brewery. These results showed that the effectiveness of the gliding arc plasma depends not only on the physico-chemical parameters of the target, but also on the exposure time and concluded that the non-thermal plasma process alone provides good reduction of organic pollutants in wastewater. Moreover, the phenomenon of post- discharge, even though not studied in details demonstrated that, after switching the discharge, the evolution of parameters such as pH, electrical conductivity and TDS increase.

  5. Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation

    Science.gov (United States)

    Liu, Zecheng; Imamura, Masato; Asano, Atsuki; Ishikawa, Kenji; Takeda, Keigo; Kondo, Hiroki; Oda, Osamu; Sekine, Makoto; Hori, Masaru

    2017-08-01

    Surface chemical reactions on the GaN surface with Cl radicals are thermally enhanced in the high-temperature Cl2 plasma etching of GaN, resulting in the formation of etch pits and thereby, a roughened surface. Simultaneous irradiation of ultraviolet (UV) photons in Cl2 plasma emissions with wavelengths of 258 and 306 nm reduces the surface chemical reactions because of the photodissociation of both Ga and N chlorides, which leads to a suppression of the increase in surface roughness. Compared with Si-related materials, we point out that photon-induced reactions should be taken into account during the plasma processing of wide-bandgap semiconductors.

  6. Synthesis and characterization of well-aligned carbon nitrogen nanotubes by microwave plasma chemical vapor deposition

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    Well-aligned carbon nitrogen nanotube films have been synthesized successfully on mesoporous silica substrates by microwave plasma chemical vapor deposition (MWPCVD) method. Studies on their morphology, structure, and composition by scanning electron microscopy (SEM), transmission electron microscopy (TEM), and energy dispersive X-ray spectroscopy (EDX), respectively, indicate that these nanotubes consist of linearly polymerized carbon nitrogen nanobells, and the nitrogen atoms have been doped into carbon netweork to form a new structure C1-xNx (x=0.16±0.01). X-ray photoelectron spectroscopy (XPS) results of the samples further demonstrate that carbon bonds covalently with nitrogen in all the carbon nitrogen nanotube films.

  7. Studies on non-oxide coating on carbon fibers using plasma enhanced chemical vapor deposition technique

    Science.gov (United States)

    Patel, R. H.; Sharma, S.; Prajapati, K. K.; Vyas, M. M.; Batra, N. M.

    2016-05-01

    A new way of improving the oxidative behavior of carbon fibers coated with SiC through Plasma Enhanced Chemical Vapor Deposition technique. The complete study includes coating of SiC on glass slab and Stainless steel specimen as a starting test subjects but the major focus was to increase the oxidation temperature of carbon fibers by PECVD technique. This method uses relatively lower substrate temperature and guarantees better stoichiometry than other coating methods and hence the substrate shows higher resistance towards mechanical and thermal stresses along with increase in oxidation temperature.

  8. Synthesis of carbon nanotube array using corona discharge plasma-enhanced chemical vapor deposition

    Institute of Scientific and Technical Information of China (English)

    2003-01-01

    A corona discharge plasma-enhanced chemical vapor deposition with the features of atmospheric pressure and low temperature has been developed to synthesize the carbon nanotube array. The array was synthesized from methane and hydrogen mixture in anodic aluminum oxide template channels in that cobalt was electrodeposited at the bottom. The characterization results by the scanning electron microscopy, transmission electron microscopy, energy dispersive X-ray spectroscopy and Raman spectroscopy indicate that the array consists of carbon nanotubes with the diameter of about 40 nm and the length of more than 4 -m, and the carbon nanotubes are mainly restrained within the channels of templates.

  9. Chemical Equilibration and Dilepton Production of Quark-Gluon Plasma at RHIC Energies

    Institute of Scientific and Technical Information of China (English)

    龙家丽; 贺泽君; 马国亮; 马余刚; 刘波

    2004-01-01

    An evolution model of the chemically equilibrating quark-gluon plasma system has been established based on the Jiittner distribution function of partons. By studying the dilepton production of the system, we find that due to high initial temperature, large gluon density of the system as well as large gluon fusion gg → c(c-) cross section in the intermediate mass region, a dominant contribution to dileptons with intermediate masses is provided by quark-antiquark annihilation qq → l(l-) and, especially, thermal charmed quarks from the gluon fusion gg → c(c-) and quark-antiquark annihilation qq → c(c-).

  10. Chemically produced tungsten-praseodymium oxide composite sintered by spark plasma sintering

    Science.gov (United States)

    Ding, Xiao-Yu; Luo, Lai-Ma; Lu, Ze-Long; Luo, Guang-Nan; Zhu, Xiao-Yong; Cheng, Ji-Gui; Wu, Yu-Cheng

    2014-11-01

    Pr2O3 doped W composite were synthesized by a novel wet chemical method and spark plasma sintering. The grain size, relative density and the Vicker hardness HV0.2 of Pr2O3/W samples were 4 μm, 98.3% and 377.2, respectively. The tensile strength values of Pr2O3/W were higher than those of pure W. As the temperature rises from 25 °C to 800 °C, the conductivity of pure W and W-1 wt% Pr2O3 composites decreased with the same trend, was above 150 W/m K.

  11. Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH4/N2/H2 Plasmas.

    Science.gov (United States)

    Truscott, Benjamin S; Kelly, Mark W; Potter, Katie J; Ashfold, Michael N R; Mankelevich, Yuri A

    2016-11-03

    We report a combined experimental and modeling study of microwave-activated dilute CH4/N2/H2 plasmas, as used for chemical vapor deposition (CVD) of diamond, under very similar conditions to previous studies of CH4/H2, CH4/H2/Ar, and N2/H2 gas mixtures. Using cavity ring-down spectroscopy, absolute column densities of CH(X, v = 0), CN(X, v = 0), and NH(X, v = 0) radicals in the hot plasma have been determined as functions of height, z, source gas mixing ratio, total gas pressure, p, and input power, P. Optical emission spectroscopy has been used to investigate, with respect to the same variables, the relative number densities of electronically excited species, namely, H atoms, CH, C2, CN, and NH radicals and triplet N2 molecules. The measurements have been reproduced and rationalized from first-principles by 2-D (r, z) coupled kinetic and transport modeling, and comparison between experiment and simulation has afforded a detailed understanding of C/N/H plasma-chemical reactivity and variations with process conditions and with location within the reactor. The experimentally validated simulations have been extended to much lower N2 input fractions and higher microwave powers than were probed experimentally, providing predictions for the gas-phase chemistry adjacent to the diamond surface and its variation across a wide range of conditions employed in practical diamond-growing CVD processes. The strongly bound N2 molecule is very resistant to dissociation at the input MW powers and pressures prevailing in typical diamond CVD reactors, but its chemical reactivity is boosted through energy pooling in its lowest-lying (metastable) triplet state and subsequent reactions with H atoms. For a CH4 input mole fraction of 4%, with N2 present at 1-6000 ppm, at pressure p = 150 Torr, and with applied microwave power P = 1.5 kW, the near-substrate gas-phase N atom concentration, [N]ns, scales linearly with the N2 input mole fraction and exceeds the concentrations [NH]ns, [NH2]ns

  12. Plasma chemical reduction of model corrosion brass layers prepared in soil

    Science.gov (United States)

    Radkova, Lucie; Mikova, Petra; Prikryl, Radek; Krcma, Frantisek

    2016-08-01

    The brass plates of (50 × 10 × 1) mm3 were prepared with model corrosion layer because the real archaeological artifacts could be damaged during the method optimization. Samples corroded naturally more than 2 years in the soil. Excavated samples were treated in the low pressure (150 Pa) quartz glass plasma reactor (90 cm long and 9.5 cm in diameter) which was surrounded by two external copper electrodes supplied by radio-frequency generator (13.56 MHz). The experiments were carried out in a hydrogen-argon gas mixture at mass flows of 30 sccm for hydrogen and 20 sccm for argon for 90 min. The plasma power was 100, 200, 300 and 400 W in continuous and pulsed mode. Maximum sample temperature was set at 120 °C. The whole process was monitored by optical emission spectroscopy and the obtained data were used to calculate the relative intensity of OH radicals and rotational temperature. The results showed that the higher power had the greater maximum intensity of the OH radicals and rapidly degraded the corrosion layer. Corrosion layer was not completely removed during the reduction, but due to the reactions which occur in the plasma corrosion layer became brittle and after plasma chemical treatment can be removed easily. Finally, the SEM-EDX analysis of the surface composition confirmed removal of chlorine and oxygen from the corrosion products layers. Contribution to the topical issue "6th Central European Symposium on Plasma Chemistry (CESPC-6)", edited by Nicolas Gherardi, Ester Marotta and Cristina Paradisi

  13. High quality plasma-enhanced chemical vapor deposited silicon nitride films

    Energy Technology Data Exchange (ETDEWEB)

    Cotler, T.J.; Chapple-Sokol, J. (IBM General Technology Division, Hopewell Junction, NY (United States))

    1993-07-01

    The qualities of plasma-enhanced chemical vapor deposited (PECVD) silicon nitride films can be improved by increasing the deposition temperature. This report compares PECVD silicon nitride films to low pressure chemical vapor deposited (LPCVD) films. The dependence of the film properties on process parameters, specifically power and temperature, are investigated. The stress is shown to shift from tensile to compressive with increasing temperature and power. The deposition rate, uniformity, wet etch rate, index of refraction, composition, stress, hydrogen content, and conformality are considered to evaluate the film properties. Temperature affects the hydrogen content in the films by causing decreased incorporation of N-H containing species whereas the dependence on power is due to changes in the gas-phase precursors. All PECVD film properties, with the exception of conformality, are comparable to those of LPCVD films.

  14. Structural, Mechanical and Optical Properties of Plasma-chemical Si-C-N Films

    Directory of Open Access Journals (Sweden)

    A.O. Kozak

    2014-11-01

    Full Text Available An influence of the substrate temperature in the range of 40-400 °C on the properties of the Si-C-N films deposited by plasma enhanced chemical vapor deposition (PECVD technique using hexamethyldisilazane is analyzed. Study of the structure, chemical bonding, surface morphology, mechanical properties and energy gap of the obtained films was carried out using X-ray diffraction, infrared spectroscopy, X-ray photoelectron spectroscopy, atomic force microscopy, optical measurements and nanoindentation. It was established that all the films were X-ray amorphous and had low surface roughness. Intensive hydrogen effusion from the films takes place, when substrate temperature increases up to 400 °C, which promotes a decrease of roughness and an increase in hardness and Young modules more than twice.

  15. Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition

    Institute of Scientific and Technical Information of China (English)

    YAO Kailun; ZHENG Jianwan; LIU Zuli; JIA Lihui

    2007-01-01

    In this paper,the characterization of thin films,deposited with the precursor ferrocene(FcH)by the plasma enhanced chemical vapour deposition(PECVD)technique,was investigated.The films were measured by Scanning Electronic Microscopy(SEM),Atomic Force Microscopy(AFM),Electron Spectroscopy for Chemical Analysis(ESCA),and superconducting Quantum Interference Device(SQUID).It was observed that the film's layer is homogeneous in thickness and has a dense morphology without cracks.The surface roughness is about 36 nm.From the results of ESCA,it can be inferred that the film mainly contains the compound FeOOH,and carbon is combined with oxygen in different forms under different supply-powers.The hysteresis loops indicate that the film is of soft magnetism.

  16. Formation of radical and active chemical species in electrical discharge plasma in the presence of liquid water

    Energy Technology Data Exchange (ETDEWEB)

    Locke, B.R.; Shih, K.Y.; Burlica, R. [Florida State Univ., Tallahassee, FL (United States). Dept. of Chemical and Biomedical Engineering

    2010-07-01

    This study investigated the interactions of plasma with liquid water using a combination of emission spectroscopy of radical and atomic species and direct measurements of more stable chemical compounds. The study focused on electrical discharge plasma formed directly in liquid water and on discharges formed in the gas phase above liquid water, in bubbles in liquid water, and in the gas phase with water droplet spray that result in a variety of active chemical species that can be used for pollution control as well as other applications in biomedical and materials engineering. The purpose was to improve the design and operation of plasma reactors for a variety of applications. This presentation also reviewed the mechanisms for the formation of active chemical species such as hydroxyl and other radicals, hydrogen peroxide and molecular hydrogen, in electrical discharge plasma formed in the presence of water.

  17. Aerosol physical and chemical properties retrieved from ground-based remote sensing measurements during heavy haze days in Beijing winter

    Science.gov (United States)

    Li, Z.; Gu, X.; Wang, L.; Li, D.; Xie, Y.; Li, K.; Dubovik, O.; Schuster, G.; Goloub, P.; Zhang, Y.; Li, L.; Ma, Y.; Xu, H.

    2013-10-01

    With the increase in economic development over the past thirty years, many large cities in eastern and southwestern China are experiencing increased haze events and atmospheric pollution, causing significant impacts on the regional environment and even climate. However, knowledge on the aerosol physical and chemical properties in heavy haze conditions is still insufficient. In this study, two winter heavy haze events in Beijing that occurred in 2011 and 2012 were selected and investigated by using the ground-based remote sensing measurements. We used a CIMEL CE318 sun-sky radiometer to retrieve haze aerosol optical, physical and chemical properties, including aerosol optical depth (AOD), size distribution, complex refractive indices and aerosol fractions identified as black carbon (BC), brown carbon (BrC), mineral dust (DU), ammonium sulfate-like (AS) components and aerosol water content (AW). The retrieval results from a total of five haze days showed that the aerosol loading and properties during the two winter haze events were comparable. Therefore, average heavy haze property parameters were drawn to present a research case for future studies. The average AOD is about 3.0 at 440 nm, and the Ångström exponent is 1.3 from 440 to 870 nm. The fine-mode AOD is 2.8 corresponding to a fine-mode fraction of 0.93. The coarse particles occupied a considerable volume fraction of the bimodal size distribution in winter haze events, with the mean particle radius of 0.21 and 2.9 μm for the fine and coarse modes respectively. The real part of the refractive indices exhibited a relatively flat spectral behavior with an average value of 1.48 from 440 to 1020 nm. The imaginary part showed spectral variation, with the value at 440 nm (about 0.013) higher than the other three wavelengths (about 0.008 at 675 nm). The aerosol composition retrieval results showed that volume fractions of BC, BrC, DU, AS and AW are 1, 2, 49, 15 and 33%, respectively, on average for the investigated

  18. Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Inhye [Department of Materials Science and Engineering, Hanyang University, Seoul 04763, South Korea and System LSI Manufacturing Operation Center, Samsung Electronics Co., Ltd, Gyeonggi-do 17113 (Korea, Republic of); Park, Jingyu; Jeon, Heeyoung; Kim, Hyunjung; Shin, Changhee [Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 04763 (Korea, Republic of); Shin, Seokyoon; Lee, Kunyoung [Department of Materials Science and Engineering, Hanyang University, Seoul 04763 (Korea, Republic of); Jeon, Hyeongtag, E-mail: hjeon@hanyang.ac.kr [Department of Materials Science and Engineering, Hanyang University, Seoul 04763, South Korea and Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 04763 (Korea, Republic of)

    2016-05-15

    In this study, the effects of a thin Ru interlayer on the thermal and morphological stability of NiSi have been investigated. Ru and Ni thin films were deposited sequentially to form a Ni/Ru/Si bilayered structure, without breaking the vacuum, by remote plasma atomic layer deposition (RPALD) on a p-type Si wafer. After annealing at various temperatures, the thermal stabilities of the Ni/Ru/Si and Ni/Si structures were investigated by various analysis techniques. The results showed that the sheet resistance of the Ni/Ru/Si sample was consistently lower compared to the Ni/Si sample over the entire temperature range. Although both samples exhibited the formation of NiSi{sub 2} phases at an annealing temperature of 800 °C, as seen with glancing angle x-ray diffraction, the peaks of the Ni/Ru/Si sample were observed to have much weaker intensities than those obtained for the Ni/Si sample. Moreover, the NiSi film with a Ru interlayer exhibited a better interface and improved surface morphologies compared to the NiSi film without a Ru interlayer. These results show that the phase transformation of NiSi to NiSi{sub 2} was retarded and that the smooth NiSi/Si interface was retained due to the activation energy increment for NiSi{sub 2} nucleation that is caused by adding a Ru interlayer. Hence, it can be said that the Ru interlayer deposited by RPALD can be used to control the phase transformation and physical properties of nickel silicide phases.

  19. Surface modification of silicon-containing fluorocarbon films prepared by plasma-enhanced chemical vapor deposition

    Science.gov (United States)

    Jin, Yoonyoung; Desta, Yohannes; Goettert, Jost; Lee, G. S.; Ajmera, P. K.

    2005-07-01

    Surface modification of silicon-containing fluorocarbon (SiCF) films achieved by wet chemical treatments and through x-ray irradiation is examined. The SiCF films were prepared by plasma-enhanced chemical vapor deposition, using gas precursors of tetrafluoromethane and disilane. As-deposited SiCF film composition was analyzed by x-ray photoelectron spectroscopy. Surface modification of SiCF films utilizing n-lithiodiaminoethane wet chemical treatment is discussed. Sessile water-drop contact angle changed from 95°+/-2° before treatment to 32°+/-2° after treatment, indicating a change in the film surface characteristics from hydrophobic to hydrophilic. For x-ray irradiation on the SiCF film with a dose of 27.4 kJ/cm3, the contact angle of the sessile water drop changed from 95°+/-2° before radiation to 39°+/-3° after x-ray exposure. The effect of x-ray exposure on chemical bond structure of SiCF films is studied using Fourier transform infrared measurements. Electroless Cu deposition was performed to test the applicability of the surface modified films. The x-ray irradiation method offers a unique advantage in making possible surface modification in a localized area of high-aspect-ratio microstructures. Fabrication of a Ti-membrane x-ray mask is introduced here for selective surface modification using x-ray irradiation.

  20. Comparison of remote consequences in Taraxacum officinale seed progeny collected in radioactively or chemically contaminated areas.

    Science.gov (United States)

    Pozolotina, Vera N; Antonova, Elena V; Bezel, Victor S

    2012-10-01

    We carried out a comparative study of seed progeny taken from the dandelion (Taraxacum officinale s.l.) coenopopulations exposed for a long time to radioactive or chemical contamination originated from the East-Ural radioactive trace zone (EURT) or Nizhniy Tagil metallurgical combine impact zone (NTMC), respectively. Coenopopulations from EURT, NTMC and background areas significantly differ from each other with respect to the qualitative and quantitative composition of allozyme phenes. An analysis of clonal diversity showed the uniqueness of all coenopopulations in terms of their phenogenetics. P-generation seed viability was found to decrease in a similar manner as all types of the industrial stress increased. Studies of F (1)-generation variability in radio- and metal resistance by family analysis showed that seed progeny from EURT impact zone possessed high viability that, however, was accompanied by development of latent injuries resulting in low resistance to additional man-caused impacts. In F (1)-generation originated from NTMC zone, high seed viability was combined with increased resistance to provocative heavy metal and radiation exposure. No significant differences in responses to 'habitual' and 'new' factors, i.e. pre-adaptation effect, were found in samples from the contaminated areas.

  1. A solid-state nuclear magnetic resonance study of post-plasma reactions in organosilicone microwave plasma-enhanced chemical vapor deposition (PECVD) coatings.

    Science.gov (United States)

    Hall, Colin J; Ponnusamy, Thirunavukkarasu; Murphy, Peter J; Lindberg, Mats; Antzutkin, Oleg N; Griesser, Hans J

    2014-06-11

    Plasma-polymerized organosilicone coatings can be used to impart abrasion resistance and barrier properties to plastic substrates such as polycarbonate. Coating rates suitable for industrial-scale deposition, up to 100 nm/s, can be achieved through the use of microwave plasma-enhanced chemical vapor deposition (PECVD), with optimal process vapors such as tetramethyldisiloxane (TMDSO) and oxygen. However, it has been found that under certain deposition conditions, such coatings are subject to post-plasma changes; crazing or cracking can occur anytime from days to months after deposition. To understand the cause of the crazing and its dependence on processing plasma parameters, the effects of post-plasma reactions on the chemical bonding structure of coatings deposited with varying TMDSO-to-O2 ratios was studied with (29)Si and (13)C solid-state magic angle spinning nuclear magnetic resonance (MAS NMR) using both single-pulse and cross-polarization techniques. The coatings showed complex chemical compositions significantly altered from the parent monomer. (29)Si MAS NMR spectra revealed four main groups of resonance lines, which correspond to four siloxane moieties (i.e., mono (M), di (D), tri (T), and quaternary (Q)) and how they are bound to oxygen. Quantitative measurements showed that the ratio of TMDSO to oxygen could shift the chemical structure of the coating from 39% to 55% in Q-type bonds and from 28% to 16% for D-type bonds. Post-plasma reactions were found to produce changes in relative intensities of (29)Si resonance lines. The NMR data were complemented by Fourier transform infrared (FTIR) spectroscopy. Together, these techniques have shown that the bonding environment of Si is drastically altered by varying the TMDSO-to-O2 ratio during PECVD, and that post-plasma reactions increase the cross-link density of the silicon-oxygen network. It appears that Si-H and Si-OH chemical groups are the most susceptible to post-plasma reactions. Coatings produced at a

  2. "Chemical" composition of the Quark-Gluon Plasma in relativistic heavy-ion collisions

    CERN Document Server

    Scardina, F; Plumari, S; Greco, V

    2012-01-01

    We study the evolution of the quark-gluon composition of the plasma created in ultra-Relativistic Heavy Ion Collisions (uRHIC's) employing a partonic transport theory that includes both elastic and inelastic collisions plus a mean fields dynamics associated to the widely used quasi-particle model. The latter, able to describe lattice QCD thermodynamics, implies a "chemical" equilibrium ratio between quarks and gluons strongly increasing as $T\\rightarrow T_c$, the phase transition temperature. Accordingly we see in realistic simulations of uRHIC's a rapid evolution from a gluon dominated initial state to a quark dominated plasma close to $T_c$. The quark to gluon ratio can be modified by about a factor of $\\sim 20$ in the bulk of the system and appears to be large also in the high $p_T$ region. We discuss how this aspect, often overflown, can be essential for a quantitative study of several key issues in the QGP physics: shear viscosity, jet quenching, quarkonia suppression. Furthemore a bulk plasma made by mo...

  3. Surface chemical structure and doping characteristics of boron-doped Si nanowires fabricated by plasma doping

    Science.gov (United States)

    Oh, Seung-Hoon; Ma, Jin-Won; Bae, Jung Min; Kang, Yu-seon; Ahn, Jae-Pyung; Kang, Hang-Kyu; Chae, Jimin; Suh, Dongchan; Song, Woobin; Kim, Sunjung; Cho, Mann-Ho

    2017-10-01

    We investigated the conduction characteristics of plasma-doped Si nanowires (NWs) after various rapid thermal annealing (RTA) times. The plasma doping (PD) process developed a highly-deposited B layer at the NW surface. RTA process controls electrical conductivity by mediating the dopant diffusion from the surface layer. The surface chemical and substitutional states of the B plasma-doped Si NWs were analyzed by x-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. To elucidate the detailed structure of the NWs, we analyzed the change in the optical phonon mode caused by the incorporated B atoms. For this purpose, we examined Fano resonance by the investigation of the asymmetry, line-width, and phonon wavenumber in Raman spectra. The changes in symmetry level of the Raman peak, phonon lifetime, and internal strain were closely related to the number of electrically activated borons, which was drastically increased with RTA time. The change in electrical and optical characterizations related to the doping characteristics of the NWs was investigated using a 4-point probe and terahertz time-domain spectroscopy (THz-TDS). The resistivity of the NWs was 3000 times lower after the annealing process compared to that before the annealing process, which is well consistent with the optical conductivity data. The data provide the potential utility of PD in conformal doping for three-dimensional nanodevices.

  4. Decontamination of Chemical/Biological Warfare (CBW) Agents Using an Atmospheric Pressure Plasma Jet (APPJ)

    Science.gov (United States)

    Herrmann, Hans W.

    1998-11-01

    The atmospheric pressure plasma jet (APPJ) is a non-thermal, high pressure, uniform glow discharge that produces a high velocity effluent stream of highly reactive chemical species. The discharge operates on a feedstock gas (e.g. He/O_2/H_2O) which flows between an outer, grounded, cylindrical electrode and an inner, coaxial electrode powered at 13.56 MHz RF. While passing through the plasma, the feedgas becomes excited, dissociated or ionized by electron impact. Once the gas exits the discharge volume, ions and electrons are rapidly lost by recombination, but the fast-flowing effluent still contains metastables (e.g. O2*, He*) and radicals (e.g. O, OH). These reactive species have been shown to be effective neutralizers of surrogates for anthrax spores, mustard blister agent and VX nerve gas. Unlike conventional, wet decontamination methods, the plasma effluent does not cause corrosion of most surfaces and does not damage wiring, electronics, nor most plastics. This makes it highly suitable for decontamination of high value sensitive equipment such as is found in vehicle interiors (i.e. tanks, planes...) for which there is currently no good decontamination technique. Furthermore, the reactive species rapidly degrade into harmless products leaving no lingering residue or harmful byproducts. Physics of the APPJ will be discussed and results of surface decontamination experiments using simulant and actual CBW agents will be presented.

  5. News from the Galactic suburbia: the chemical composition of the remote globular cluster NGC 2419

    Science.gov (United States)

    Mucciarelli, A.; Bellazzini, M.; Ibata, R.; Merle, T.; Chapman, S. C.; Dalessandro, E.; Sollima, A.

    2012-11-01

    We present the chemical analysis of 49 giant stars of the globular cluster NGC 2419, using medium resolution spectra collected with the multi-object spectrograph DEIMOS@Keck. Previous analysis of this cluster revealed a large dispersion in the line strength of the infrared Ca II triplet, suggesting an intrinsic star-to-star scatter in its Fe or Ca content. From our analysis, we assess that all the investigated stars share the same [Fe/H], [Ca/Fe] and [Ti/Fe] abundance ratios, while a large spread in Mg and K abundances is detected. The distribution of [Mg/Fe] is bimodal, with ˜40 per cent of the observed targets having subsolar [Mg/Fe], down to [Mg/Fe] ˜ -1 dex, a level of Mg deficiency never observed before in globular clusters. It is found that the large dispersion in Mg abundances is likely the main origin of the observed dispersion of the Ca II triplet lines strengths (that can be erroneously interpreted in terms of Fe or Ca abundance scatter) because Mg plays a relevant role in the atmosphere of giant stars as an electron donor. A strong depletion in the Mg abundance leads to an increase of the line strength of the Ca II triplet, due to the variation in the electronic pressure, at a constant Fe and Ca abundance. Finally, we detect an anti-correlation between Mg and K abundances, not easily explainable within the framework of the current nucleosynthesis models. Based on data obtained at the W. M. Keck Observatory, which is operated as a scientific partnership among the California Institute of Technology, the University of California, and the National Aeronautics and Space Administration. The Observatory was made possible by the generous financial support of the W. M. Keck Foundation.

  6. Modelling and optimization of film thickness variation for plasma enhanced chemical vapour deposition processes

    Science.gov (United States)

    Waddell, Ewan; Gibson, Des; Lin, Li; Fu, Xiuhua

    2011-09-01

    This paper describes a method for modelling film thickness variation across the deposition area within plasma enhanced chemical vapour deposition (PECVD) processes. The model enables identification and optimization of film thickness uniformity sensitivities to electrode configuration, temperature, deposition system design and gas flow distribution. PECVD deposition utilizes a co-planar 300mm diameter electrodes with separate RF power matching to each electrode. The system has capability to adjust electrode separation and electrode temperature as parameters to optimize uniformity. Vacuum is achieved using dry pumping with real time control of butterfly valve position for active pressure control. Comparison between theory and experiment is provided for PECVD of diamond-like-carbon (DLC) deposition onto flat and curved substrate geometries. The process utilizes butane reactive feedstock with an argon carrier gas. Radiofrequency plasma is used. Deposited film thickness sensitivities to electrode geometry, plasma power density, pressure and gas flow distribution are demonstrated. Use of modelling to optimise film thickness uniformity is demonstrated. Results show DLC uniformity of 0.30% over a 200 mm flat zone diameter within overall electrode diameter of 300mm. Thickness uniformity of 0.75% is demonstrated over a 200mm diameter for a non-conformal substrate geometry. Use of the modelling method for PECVD using metal-organic chemical vapour deposition (MOCVD) feedstock is demonstrated, specifically for deposition of silica films using metal-organic tetraethoxy-silane. Excellent agreement between experimental and theory is demonstrated for conformal and non-conformal geometries. The model is used to explore scalability of PECVD processes and trade-off against film thickness uniformity. Application to MEMS, optical coatings and thin film photovoltaics is discussed.

  7. Evaluation of chemical and structural properties of germanium-carbon coatings deposited by plasma enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Jamali, Hossein, E-mail: h.jamali@mut-es.ac.ir; Mozafarinia, Reza; Eshaghi, Akbar

    2015-10-15

    Germanium-carbon coatings were deposited on silicon and glass substrates by plasma enhanced chemical vapor deposition (PECVD) using three different flow ratios of GeH{sub 4} and CH{sub 4} precursors. Elemental analysis, structural evaluation and microscopic investigation of coatings were performed using laser-induced breakdown spectroscopy (LIBS), Fourier transform infrared (FTIR) spectroscopy, X-ray diffraction (XRD), Raman spectroscopy, field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM), respectively. Based on the results, the coatings exhibited a homogeneous and dense structure free of pores with a very good adhesion to substrate. The structural evaluation revealed that the germanium-carbon coatings were a kind of a Ge-rich composite material containing the amorphous and crystalline germanium and amorphous carbon with the mixture of Ge–Ge, Ge–C, C–C, Ge–H and C–H bonds. The result suggested that the amorphisation of the coatings could be increased with raising CH{sub 4}:GeH{sub 4} flow rate ratio and subsequently increasing C amount incorporated into the coating. - Highlights: • Germanium-carbon coatings were prepared by PECVD technique. • The germanium-carbon coatings were a kind of composite material. • The amorphisation of the coatings were increased with raising CH{sub 4}:GeH{sub 4} flow ratio.

  8. Practical silicon deposition rules derived from silane monitoring during plasma-enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Bartlome, Richard, E-mail: richard.bartlome@alumni.ethz.ch; De Wolf, Stefaan; Demaurex, Bénédicte; Ballif, Christophe [Ecole Polytechnique Fédérale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and Thin-Film Electronics Laboratory, Rue de la Maladière 71b, 2000 Neuchâtel (Switzerland); Amanatides, Eleftherios; Mataras, Dimitrios [University of Patras, Department of Chemical Engineering, Plasma Technology Laboratory, P.O. Box 1407, 26504 Patras (Greece)

    2015-05-28

    We clarify the difference between the SiH{sub 4} consumption efficiency η and the SiH{sub 4} depletion fraction D, as measured in the pumping line and the actual reactor of an industrial plasma-enhanced chemical vapor deposition system. In the absence of significant polysilane and powder formation, η is proportional to the film growth rate. Above a certain powder formation threshold, any additional amount of SiH{sub 4} consumed translates into increased powder formation rather than into a faster growing Si film. In order to discuss a zero-dimensional analytical model and a two-dimensional numerical model, we measure η as a function of the radio frequency (RF) power density coupled into the plasma, the total gas flow rate, the input SiH{sub 4} concentration, and the reactor pressure. The adjunction of a small trimethylboron flow rate increases η and reduces the formation of powder, while the adjunction of a small disilane flow rate decreases η and favors the formation of powder. Unlike η, D is a location-dependent quantity. It is related to the SiH{sub 4} concentration in the plasma c{sub p}, and to the phase of the growing Si film, whether the substrate is glass or a c-Si wafer. In order to investigate transient effects due to the RF matching, the precoating of reactor walls, or the introduction of a purifier in the gas line, we measure the gas residence time and acquire time-resolved SiH{sub 4} density measurements throughout the ignition and the termination of a plasma.

  9. Nitrogen Fixation by Gliding Arc Plasma: Better Insight by Chemical Kinetics Modelling.

    Science.gov (United States)

    Wang, Weizong; Patil, Bhaskar; Heijkers, Stjin; Hessel, Volker; Bogaerts, Annemie

    2017-05-22

    The conversion of atmospheric nitrogen into valuable compounds, that is, so-called nitrogen fixation, is gaining increased interest, owing to the essential role in the nitrogen cycle of the biosphere. Plasma technology, and more specifically gliding arc plasma, has great potential in this area, but little is known about the underlying mechanisms. Therefore, we developed a detailed chemical kinetics model for a pulsed-power gliding-arc reactor operating at atmospheric pressure for nitrogen oxide synthesis. Experiments are performed to validate the model and reasonable agreement is reached between the calculated and measured NO and NO2 yields and the corresponding energy efficiency for NOx formation for different N2 /O2 ratios, indicating that the model can provide a realistic picture of the plasma chemistry. Therefore, we can use the model to investigate the reaction pathways for the formation and loss of NOx . The results indicate that vibrational excitation of N2 in the gliding arc contributes significantly to activating the N2 molecules, and leads to an energy efficient way of NOx production, compared to the thermal process. Based on the underlying chemistry, the model allows us to propose solutions on how to further improve the NOx formation by gliding arc technology. Although the energy efficiency of the gliding-arc-based nitrogen fixation process at the present stage is not comparable to the world-scale Haber-Bosch process, we believe our study helps us to come up with more realistic scenarios of entering a cutting-edge innovation in new business cases for the decentralised production of fertilisers for agriculture, in which low-temperature plasma technology might play an important role. © 2017 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

  10. Chemical release experiments to induce F region ionospheric plasma irregularities at the magnetic equator

    Science.gov (United States)

    Sultan, Peter Jared

    1994-01-01

    The largest-scale plasma instability that occurs naturally in the Earth's ionosphere is a turbulent upwelling of the equatorial F region known as equatorial spread-F (ESF). During an ESF event, high plasma density magnetic fluxtubes at the bottomside of the F region are thought to change places with lower plasma density flux-tubes from below in a Rayleigh-Taylor type (heavy fluid over light fluid) instability. This interchange creates a large-scale (10's of km) density perturbation locally, which rapidly penetrates through to the topside of the F region, creating a plume of cascading smaller-scale (meter to centimeter scale) irregularities from the sharp density gradients at the edges of the rising plasma 'bubble'. In a theoretical test of this overall scenario for ESF, a linear instability growth rate is derived following the magnetic fluxtube formalism of Haerendel. Using realistic atmospheric and ionospheric density model inputs, growth rates are calculated for a range of geophysical conditions. Time/altitude domains having positive growth rates are found to coincide with observed time/altitude patterns of ESF occurrence, thus supporting the fluxtube model. The physics also are tested experimentally by the deliberate creation of plasma bubbles in ambient ionospheres that the fluxtube model predicts are susceptible to the Rayleigh-Taylor instability. Two such artificial seed perturbations were generated during the 1990 NASA/Boston University CRRES-at-Kwajalein campaign, when clouds of sulfur hexafluoride (SF6) were released by sounding rockets to initiate plasma recombinations near the bottomside of the equatorial ionosphere. Multiple diagnostics (incoherent scatter radar, high frequency radar, optics, and satellite polarimeters at several sites) were used to monitor the prelaunch status of the ionosphere and the electron depleted regions that resulted from the chemical releases. Small ESF plumes were observed to form in the region of the artificial perturbation

  11. Effect of plasma parameters on characteristics of silicon nitride film deposited by single and dual frequency plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Sahu, B. B.; Yin, Yongyi; Han, Jeon G.

    2016-03-01

    This work investigates the deposition of hydrogenated amorphous silicon nitride films using various low-temperature plasmas. Utilizing radio-frequency (RF, 13.56 MHz) and ultra-high frequency (UHF, 320 MHz) powers, different plasma enhanced chemical vapor deposition processes are conducted in the mixture of reactive N2/NH3/SiH4 gases. The processes are extensively characterized using different plasma diagnostic tools to study their plasma and radical generation capabilities. A typical transition of the electron energy distribution function from single- to bi-Maxwellian type is achieved by combining RF and ultra-high powers. Data analysis revealed that the RF/UHF dual frequency power enhances the plasma surface heating and produces hot electron population with relatively low electron temperature and high plasma density. Using various film analysis methods, we have investigated the role of plasma parameters on the compositional, structural, and optical properties of the deposited films to optimize the process conditions. The presented results show that the dual frequency power is effective for enhancing dissociation and ionization of neutrals, which in turn helps in enabling high deposition rate and improving film properties.

  12. Consequences of plasma oxidation and vacuum annealing on the chemical properties and electron accumulation of In2O3 surfaces

    Science.gov (United States)

    Berthold, Theresa; Rombach, Julius; Stauden, Thomas; Polyakov, Vladimir; Cimalla, Volker; Krischok, Stefan; Bierwagen, Oliver; Himmerlich, Marcel

    2016-12-01

    The influence of oxygen plasma treatments on the surface chemistry and electronic properties of unintentionally doped and Mg-doped In2O3(111) films grown by plasma-assisted molecular beam epitaxy or metal-organic chemical vapor deposition is studied by photoelectron spectroscopy. We evaluate the impact of semiconductor processing technology relevant treatments by an inductively coupled oxygen plasma on the electronic surface properties. In order to determine the underlying reaction processes and chemical changes during film surface-oxygen plasma interaction and to identify reasons for the induced electron depletion, in situ characterization was performed implementing a dielectric barrier discharge oxygen plasma as well as vacuum annealing. The strong depletion of the initial surface electron accumulation layer is identified to be caused by adsorption of reactive oxygen species, which induce an electron transfer from the semiconductor to localized adsorbate states. The chemical modification is found to be restricted to the topmost surface and adsorbate layers. The change in band bending mainly depends on the amount of attached oxygen adatoms and the film bulk electron concentration as confirmed by calculations of the influence of surface state density on the electron concentration and band edge profile using coupled Schrödinger-Poisson calculations. During plasma oxidation, hydrocarbon surface impurities are effectively removed and surface defect states, attributed to oxygen vacancies, vanish. The recurring surface electron accumulation after subsequent vacuum annealing can be consequently explained by surface oxygen vacancies.

  13. MICROSTRUCTURE OF SiOx:H FILMS PREPARED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

    Institute of Scientific and Technical Information of China (English)

    MA ZHI-XUN; LIAO XIAN-BO; KONG GUANG-LIN; CHU JUN-HAO

    2000-01-01

    The micro-Raman spectroscopy and infrared (IR) spectroscopy have been performed for the study of the microstructure of amorphous hydrogenated oxidized silicon (a-SiOx:H) films prepared by Plasma Enhanced Chemical Vapor Deposition technique. It is found that a-SiOx :H consists of two phases: an amorphous silicon-rich phase and an oxygen-rich phase mainly comprised of HSi-SiO2 and HSi-O3. The Raman scattering results exhibit that the frequency of TO-like mode of amorphous silicon red-shifts with decreasing size of silicon-rich region. This is related to the quantum confinement effects, similar to the nanocrystalline silicon.

  14. Microwave plasma-enhanced chemical vapour deposition growth of carbon nanostructures

    Directory of Open Access Journals (Sweden)

    Shivan R. Singh

    2010-05-01

    Full Text Available The effect of various input parameters on the production of carbon nanostructures using a simple microwave plasma-enhanced chemical vapour deposition technique has been investigated. The technique utilises a conventional microwave oven as the microwave energy source. The developed apparatus is inexpensive and easy to install and is suitable for use as a carbon nanostructure source for potential laboratory-based research of the bulk properties of carbon nanostructures. A result of this investigation is the reproducibility of specific nanostructures with the variation of input parameters, such as carbon-containing precursor and support gas flow rate. It was shown that the yield and quality of the carbon products is directly controlled by input parameters. Transmission electron microscopy and scanning electron microscopy were used to analyse the carbon products; these were found to be amorphous, nanotubes and onion-like nanostructures.

  15. Al-Induced Crystallization Growth of Si Films by Inductively Coupled Plasma Chemical Vapour Deposition

    Institute of Scientific and Technical Information of China (English)

    LI Jun-Shuai; WANG Jin-Xiao; YIN Min; GAO Ping-Qi; HE De-Yan

    2006-01-01

    Polycrystalline Si (poly-Si) films are in situ grown on Al-coated glass substrates by inductively coupled plasma chemical vapour deposition at a temperature as low as 350 C. Compared to the traditional annealing crystallization of amorphous Si/Al-layer structures, no layer exchange is observed and the resultant poly-Si film is much thicker than Al layer. By analysing the depth profiles of the elemental composition, no remains of Al atoms are detected in Si layer within the limit (< 0.01 at. %) of the used evaluations. It is indicated that the poly-Si material obtained by Al-induced crystallization growth has more potential applications than that prepared by annealing the amorphous Si/Al-layer structures.

  16. Viewing the Chemical Evolution of the Quark-Gluon Plasma with Charge Balance Functions

    CERN Document Server

    Pratt, Scott

    2013-01-01

    Correlations from charge conservation are affected by when charge/anticharge pairs are created during the course of a relativistic heavy ion collision. For charges created early, balancing charges are typically separated by the order of one unit of spatial rapidity by the end of the collision, whereas those charges produced later in the collision are far more correlated. By analyzing correlations from STAR for different species, I show that one can distinguish the two separate waves of charge creation expected in a high-energy collision, one at early times when the QGP is formed and a second at hadronization. Further, I extract the density of up, down and strange quarks at in the QGP and find agreement at the 20% level with expectations for a chemically thermalized plasma.

  17. Synthesis and characterization of well-aligned carbon nitrogen nanotubes by microwave plasma chemical vapor deposition

    Institute of Scientific and Technical Information of China (English)

    马旭村; 徐贵昌; 王恩哥

    2000-01-01

    Well-aligned carbon nitrogen nanotube films have been synthesized successfully on meso-porous silica substrates by microwave plasma chemical vapor deposition (MWPCVD) method. Studies on their morphology, structure, and composition by scanning electron microscopy (SEM), transmission electron microscopy (TEM), and energy dispersive X-ray spectroscopy (EDX), respectively, indicate that these nanotubes consist of linearly polymerized carbon nitrogen nanobells, and the nitrogen atoms have been doped into carbon netweork to form a new structure C1-xNx( x = 0.16±0.01). X-ray photoelectron spectroscopy (XPS) results of the samples further demonstrate that carbon bonds cova-lently with nitrogen in all the carbon nitrogen nanotube films.

  18. Plasma chemical and electrical modelling of a negative DC corona in pure oxygen

    Energy Technology Data Exchange (ETDEWEB)

    Soria, C [Departamento de Electronica y Electromagnetismo, Universidad de Sevilla, Av. Reina Mercedes s/n, 41012 Sevilla (Spain); Pontiga, F [Departamento de FIsica Aplicada II, Universidad de Sevilla, Av. Reina Mercedes s/n, 41012 Sevilla (Spain); Castellanos, A [Departamento de Electronica y Electromagnetismo, Universidad de Sevilla, Av. Reina Mercedes s/n, 41012 Sevilla (Spain)

    2004-02-01

    A complex plasma chemical and electrical model of a negative stationary wire-to-cylinder corona discharge in pure oxygen is presented. The corona discharge is assumed to have axial and azimuthal symmetry. The experimental current-voltage characteristic is required as input data, but there are no other adjustable or empirical parameters. The experimental validation of the results of the model comes from its prediction of the ozone concentration. The role played by different reactions and species is analysed in detail using the results of the simulation. The effect of the gas temperature and of the decomposition of ozone at the electrodes is also investigated. The agreement between the model and the experiments is excellent when the effect of ozone decomposition at the electrodes is taken into account.

  19. Preparation of carbon nanotubes with different morphology by microwave plasma enhanced chemical vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Duraia, El-Shazly M. [Suez Canal University, Faculty of Science, Physics Department, Ismailia (Egypt); Al-Farabi Kazakh National University, 71 Al-Farabi av., 050038 Almaty (Kazakhstan); Institute of Physics and Technology, Ibragimov Street 11, 050032 Almaty (Kazakhstan); Mansurov, Zulkhair [Al-Farabi Kazakh National University, 71 Al-Farabi av., 050038 Almaty (Kazakhstan); Tokmoldin, S.Zh. [Institute of Physics and Technology, Ibragimov Street 11, 050032 Almaty (Kazakhstan)

    2010-04-15

    In this work we present a part of our results about the preparation of carbon nanotube with different morphologies by using microwave plasma enhanced chemical vapour deposition MPECVD. Well aligned, curly, carbon nanosheets, coiled carbon sheets and carbon microcoils have been prepared. We have investigated the effect of the different growth condition parameters such as the growth temperature, pressure and the hydrogen to methane flow rate ratio on the morphology of the carbon nanotubes. The results showed that there is a great dependence of the morphology of carbon nanotubes on these parameters. The yield of the carbon microcoils was high when the growth temperature was 700 C. There is a linear relation between the growth rate and the methane to hydrogen ratio. The effect of the gas pressure on the CNTs was also studied. Our samples were investigated by scanning electron microscope and Raman spectroscopy (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  20. Characterization of doped hydrogenated nanocrystalline silicon films prepared by plasma enhanced chemical vapour deposition

    Institute of Scientific and Technical Information of China (English)

    Wang Jin-Liang; Wu Er-Xing

    2007-01-01

    The B-and P-doped hydrogenated nanocrystalline silicon films (nc-Si:H) are prepared by plasma-enhanced chemical vapour deposition (PECVD) .The microstructures of doped nc-Si:H films are carefully and systematically char acterized by using high resolution electron microscopy (HREM) ,Raman scattering,x-ray diffraction (XRD) ,Auger electron spectroscopy (AES) ,and resonant nucleus reaction (RNR) .The results show that as the doping concentration of PH3 increases,the average grain size (d) tends to decrease and the crystalline volume percentage (Xc) increases simultaneously.For the B-doped samples,as the doping concentration of B2H6 increases,no obvious change in the value of d is observed,but the value of Xc is found to decrease.This is especially apparent in the case of heavy B2H6 doped samples,where the films change from nanocrystalline to amorphous.

  1. Diamond synthesis at atmospheric pressure by microwave capillary plasma chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Hemawan, Kadek W.; Gou, Huiyang; Hemley, Russell J. [Geophysical Laboratory, Carnegie Institution of Washington, 5251 Broad Branch Rd., NW, Washington, DC 20015 (United States)

    2015-11-02

    Polycrystalline diamond has been synthesized on silicon substrates at atmospheric pressure, using a microwave capillary plasma chemical vapor deposition technique. The CH{sub 4}/Ar plasma was generated inside of quartz capillary tubes using 2.45 GHz microwave excitation without adding H{sub 2} into the deposition gas chemistry. Electronically excited species of CN, C{sub 2}, Ar, N{sub 2}, CH, H{sub β}, and H{sub α} were observed in the emission spectra. Raman measurements of deposited material indicate the formation of well-crystallized diamond, as evidenced by the sharp T{sub 2g} phonon at 1333 cm{sup −1} peak relative to the Raman features of graphitic carbon. Field emission scanning electron microscopy images reveal that, depending on the growth conditions, the carbon microstructures of grown films exhibit “coral” and “cauliflower-like” morphologies or well-facetted diamond crystals with grain sizes ranging from 100 nm to 10 μm.

  2. pypk - A Python extension module to handle chemical kinetics in plasma physics modeling

    Directory of Open Access Journals (Sweden)

    2008-06-01

    Full Text Available PLASMAKIN is a package to handle physical and chemical data used in plasma physics modeling and to compute gas-phase and gas-surface kinetics data: particle production and loss rates, photon emission spectra and energy exchange rates. A large number of species properties and reaction types are supported, namely: gas or electron temperature dependent collision rate coefficients, vibrational and cascade levels, evaluation of branching ratios, superelastic and other reverse processes, three-body collisions, radiation imprisonment and photoelectric emission. Support of non-standard rate coefficient functions can be handled by a user-supplied shared library.

    The main block of the PLASMAKIN package is a Fortran module that can be included in an user's program or compiled as a shared library, libpk. pypk is a new addition to the package and provides access to libpk from Python programs. It is build on top of the ctypes foreign function library module and is prepared to work with several Fortran compilers. However pypk is more than a wrapper and provides its own classes and functions taking advantage of Python language characteristics. Integration with Python tools allows substantial productivity gains on program development and insight on plasma physics problems.

  3. Conformal encapsulation of three-dimensional, bioresorbable polymeric scaffolds using plasma-enhanced chemical vapor deposition.

    Science.gov (United States)

    Hawker, Morgan J; Pegalajar-Jurado, Adoracion; Fisher, Ellen R

    2014-10-21

    Bioresorbable polymers such as poly(ε-caprolactone) (PCL) have a multitude of potential biomaterial applications such as controlled-release drug delivery and regenerative tissue engineering. For such biological applications, the fabrication of porous three-dimensional bioresorbable materials with tunable surface chemistry is critical to maximize their surface-to-volume ratio, mimic the extracellular matrix, and increase drug-loading capacity. Here, two different fluorocarbon (FC) precursors (octofluoropropane (C3F8) and hexafluoropropylene oxide (HFPO)) were used to deposit FC films on PCL scaffolds using plasma-enhanced chemical vapor deposition (PECVD). These two coating systems were chosen with the intent of modifying the scaffold surfaces to be bio-nonreactive while maintaining desirable bulk properties of the scaffold. X-ray photoelectron spectroscopy showed high-CF2 content films were deposited on both the exterior and interior of PCL scaffolds and that deposition behavior is PECVD system specific. Scanning electron microscopy data confirmed that FC film deposition yielded conformal rather than blanket coatings as the porous scaffold structure was maintained after plasma treatment. Treated scaffolds seeded with human dermal fibroblasts (HDF) demonstrate that the cells do not attach after 72 h and that the scaffolds are noncytotoxic to HDF. This work demonstrates conformal FC coatings can be deposited on 3D polymeric scaffolds using PECVD to fabricate 3D bio-nonreactive materials.

  4. Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films

    Energy Technology Data Exchange (ETDEWEB)

    Broas, Mikael, E-mail: mikael.broas@aalto.fi; Vuorinen, Vesa [Department of Electrical Engineering and Automation, Aalto University, P.O. Box 13500, FIN-00076 Aalto, Espoo (Finland); Sippola, Perttu; Pyymaki Perros, Alexander; Lipsanen, Harri [Department of Micro- and Nanosciences, Aalto University, P.O. Box 13500, FIN-00076 Aalto, Espoo (Finland); Sajavaara, Timo [Department of Physics, University of Jyväskylä, P.O. Box 35, FIN-40014 Jyväskylä (Finland); Paulasto-Kröckel, Mervi [Department of Electrical Engineering and Automation, Aalto University. P.O. Box 13500, FIN-00076 Aalto, Espoo (Finland)

    2016-07-15

    Plasma-enhanced atomic layer deposition was utilized to grow aluminum nitride (AlN) films on Si from trimethylaluminum and N{sub 2}:H{sub 2} plasma at 200 °C. Thermal treatments were then applied on the films which caused changes in their chemical composition and nanostructure. These changes were observed to manifest in the refractive indices and densities of the films. The AlN films were identified to contain light element impurities, namely, H, C, and excess N due to nonideal precursor reactions. Oxygen contamination was also identified in the films. Many of the embedded impurities became volatile in the elevated annealing temperatures. Most notably, high amounts of H were observed to desorb from the AlN films. Furthermore, dinitrogen triple bonds were identified with infrared spectroscopy in the films. The triple bonds broke after annealing at 1000 °C for 1 h which likely caused enhanced hydrolysis of the films. The nanostructure of the films was identified to be amorphous in the as-deposited state and to become nanocrystalline after 1 h of annealing at 1000 °C.

  5. Luminescent Nanocrystalline Silicon Carbide Thin Film Deposited by Helicon Wave Plasma Enhanced Chemical Vapour Deposition

    Institute of Scientific and Technical Information of China (English)

    LU Wan-bing; YU Wei; WU Li-ping; CUI Shuang-kui; FU Guang-sheng

    2006-01-01

    Hydrogenated nanocrystalline silicon carbide (SiC) thin films were deposited on the single-crystal silicon substrate using the helicon wave plasma enhanced chemical vapor deposition (HW-PECVD) technique. The influences of magnetic field and hydrogen dilution ratio on the structures of SiC thin film were investigated with the atomic force microscopy (AFM), the Fourier transform infrared absorption (FTIR) and the transmission electron microscopy (TEM). The results indicate that the high plasma activity of the helicon wave mode proves to be a key factor to grow crystalline SiC thin films at a relative low substrate temperature. Also, the decrease in the grain sizes from the level of microcrystalline to that of nanocrystalline can be achieved by increasing the hydrogen dilution ratios. Transmission electron microscopy measurements reveal that the size of most nanocrystals in the film deposited under the higher hydrogen dilution ratios is smaller than the doubled Bohr radius of 3C-SiC (approximately 5.4 nm), and the light emission measurements also show a strong blue photoluminescence at the room temperature, which is considered to be caused by the quantum confinement effect of small-sized SiC nanocrystals.

  6. Modification of tapioca starch by non-chemical route using jet atmospheric argon plasma.

    Science.gov (United States)

    Wongsagonsup, Rungtiwa; Deeyai, Panakamol; Chaiwat, Weerawut; Horrungsiwat, Sawanee; Leejariensuk, Kesini; Suphantharika, Manop; Fuongfuchat, Asira; Dangtip, Somsak

    2014-02-15

    Non-chemical modification of tapioca starch was investigated using jet atmospheric argon plasma treatment. Two forms of starch slurry, i.e. granular starch (G) and cooked starch (C), were jet-treated by argon plasma generated by supplying input power of 50 W (denoted as G50 and C50 samples) and 100 W (denoted as G100 and C100 samples) for 5 min. Physical, rheological, and structural characteristics of the modified starch were investigated. The G50 and C100 samples had lower paste clarity but higher thermal stability and performed stronger gels (G50 only) compared to their control counterparts. On the other hand, the analyzed properties of the G100 and C50 samples showed the opposite trend. FTIR and (1)H NMR results revealed that the relative areas of COC and OH peaks were changed after the treatment. Cross-linking reaction seemed to predominantly take place for the G50 and C100 samples, whereas depolymerization predominated for the G100 and C50 samples.

  7. Applications of non-equilibrium plasma in chemical processes; Aplicaciones de plasmas de no-equilibrio en procesos quimicos

    Energy Technology Data Exchange (ETDEWEB)

    Patino, P.; Castro, A. [Escuela de Quimica, Facultad de Ciencias, Universidad Central de Venezuela, P.O. Box 47102, Caracas 1041A (Venezuela)]. e-mail: ppatino@strix.ciens.ucv.ve

    2003-07-01

    By means of optical emission spectroscopy the population of O({sup 3}P) in a non-equilibrium, high voltage, oxygen plasma, and O({sup 3}P), H and OH in another of steam in radio frequency, have been followed. Reactions of both plasmas with liquid hydrocarbons have produced oxidation and/or hydrogenation, depending on the conditions of each one. (Author)

  8. Photon Production in a Chemically Equilibrating Quark-Gluon Plasma at Finite Baryon Density: Complete Leading Order Results

    Institute of Scientific and Technical Information of China (English)

    LONG Jia-Li; HE Ze-Jun; MA Yu-Gang

    2006-01-01

    @@ We investigate hard photon production of the near-collinear bremsstrahlung and a new process called the inelastic pair annihilation, fully including the LPM effect, in a chemically equilibrating quark-gluon plasma at finite baryon density, and find that the effect of the system evolution on the photon production and large contribution of the bremsstrahlung make the total photon yield of the two processes as a strongly increasing function of the initial quark chemical potential.

  9. Cytotoxicity of Boron-Doped Nanocrystalline Diamond Films Prepared by Microwave Plasma Chemical Vapor Deposition

    Science.gov (United States)

    Liu, Dan; Gou, Li; Ran, Junguo; Zhu, Hong; Zhang, Xiang

    2015-07-01

    Boron-doped nanocrystalline diamond (NCD) exhibits extraordinary mechanical properties and chemical stability, making it highly suitable for biomedical applications. For implant materials, the impact of boron-doped NCD films on the character of cell growth (i.e., adhesion, proliferation) is very important. Boron-doped NCD films with resistivity of 10-2 Ω·cm were grown on Si substrates by the microwave plasma chemical vapor deposition (MPCVD) process with H2 bubbled B2O3. The crystal structure, diamond character, surface morphology, and surface roughness of the boron-doped NCD films were analyzed using different characterization methods, such as X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM) and atomic force microscopy (AFM). The contact potential difference and possible boron distribution within the film were studied with a scanning kelvin force microscope (SKFM). The cytotoxicity of films was studied by in vitro tests, including fluorescence microscopy, SEM and MTT assay. Results indicated that the surface roughness value of NCD films was 56.6 nm and boron was probably accumulated at the boundaries between diamond agglomerates. MG-63 cells adhered well and exhibited a significant growth on the surface of films, suggesting that the boron-doped NCD films were non-toxic to cells. supported by the Open Foundation of State Key Laboratory of Electronic Thin Films and Integrated Devices (University of Electronic Science and Technology of China) (No. KFJJ201313)

  10. Plasma Enhanced Chemical Vapor Deposition Nanocrystalline Tungsten Carbide Thin Film and Its Electro-catalytic Activity

    Institute of Scientific and Technical Information of China (English)

    Huajun ZHENG; Chunan MA; Jianguo HUANG; Guohua LI

    2005-01-01

    Nanocrystalline tungsten carbide thin films were fabricated on graphite substrates by plasma enhanced chemical vapor deposition (PECVD) at H2 and Ar atmosphere, using WF6 and CH4 as precursors. The crystal phase, structure and chemical components of the films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and energy-dispersive spectrometer (EDS), respectively. The results show that the film prepared at CH4/WF6concentration ratio of 20 and at 800℃ is composed of spherical particles with a diameter of 20~35 nm. Electrochemical investigations show that the electrochemical real surface area of electrode of the film is large, and the electrode of the film exhibits higher electro-catalytic activity in the reaction of methanol oxidation. The designated constant current of the film catalyst is 123.6 mA/cm2 in the mixture solution of H2SO4 and CH3OH at the concentration of 0.5 and 2.0 mol/L at 70℃, and the designated constant potential is only 0.306 V (vs SCE).

  11. Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells

    Directory of Open Access Journals (Sweden)

    K. Sharma

    2014-01-01

    Full Text Available Aluminium-doped zinc oxide (ZnO:Al grown by expanding thermal plasma chemical vapour deposition (ETP-CVD has demonstrated excellent electrical and optical properties, which make it an attractive candidate as a transparent conductive oxide for photovoltaic applications. However, when depositing ZnO:Al on CIGS solar cell stacks, one should be aware that high substrate temperature processing (i.e., >200°C can damage the crucial underlying layers/interfaces (such as CIGS/CdS and CdS/i-ZnO. In this paper, the potential of adopting ETP-CVD ZnO:Al in CIGS solar cells is assessed: the effect of substrate temperature during film deposition on both the electrical properties of the ZnO:Al and the eventual performance of the CIGS solar cells was investigated. For ZnO:Al films grown using the high thermal budget (HTB condition, lower resistivities, ρ, were achievable (~5 × 10−4 Ω·cm than those grown using the low thermal budget (LTB conditions (~2 × 10−3 Ω·cm, whereas higher CIGS conversion efficiencies were obtained for the LTB condition (up to 10.9% than for the HTB condition (up to 9.0%. Whereas such temperature-dependence of CIGS device parameters has previously been linked with chemical migration between individual layers, we demonstrate that in this case it is primarily attributed to the prevalence of shunt currents.

  12. Organo-Functionalization of Silicon Nanocrystals Synthesized by Inductively Coupled Plasma Chemical Vapor Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Don-Sung; Choe, Dong-Hoe; Jeong, Hyun-Dam [Chonnam National University, Gwangju (Korea, Republic of); Yoo, Seung-Wan; Kim, Jung-Hyung [Korea Research Institute of Standards and Science, Daejeon (Korea, Republic of)

    2016-05-15

    Octadecyl-terminated silicon nanocrystals (ODE-Si NCs) are obtained via a surface-initiated thermal hydrosilylation reaction on hydride-terminated Si NCs (H-Si NCs). Pristine Si NCs were synthesized at the gram scale by using inductively coupled plasma chemical vapor deposition (ICP-CVD) . The H-Si NCs were produced through a chemical etching process with hydrofluoric acid (HF), ethanol (EtOH), and distilled water (d-H{sub 2}O). The results obtained from X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM) indicate that the synthesized Si NCs obtained via ICP-CVD have diamond cubic-structured silicon with a grain size of 10 nm and a densely packed Si NC array consisting of individual NCs. Organo-functionalized Si NCs, i.e., ODE-Si NCs, are well soluble in organic solvent whereas pristine Si NCs synthesized through ICP-CVD are not. The surface chemistry of the ODE-Si NCs was confirmed via Fourier transform infrared spectroscopy (FT-IR), proton nuclear magnetic resonance spectroscopy ({sup 1}H-NMR), and field emission transmission electron microscopy (FE-TEM). Thereby, these newly synthesized and scalable organo-functionalized Si NCs are applicable as raw materials for practical use in devices by tuning the surface chemistry with various capping molecules.

  13. Chemically produced tungsten–praseodymium oxide composite sintered by spark plasma sintering

    Energy Technology Data Exchange (ETDEWEB)

    Ding, Xiao-Yu [School of Materials Science and Engineering, Hefei University of Technology, Hefei 230009 (China); Luo, Lai-Ma, E-mail: luolaima@126.com [School of Materials Science and Engineering, Hefei University of Technology, Hefei 230009 (China); Engineering Research Center of Powder Metallurgy of Anhui Province, Hefei 230009 (China); Lu, Ze-Long [School of Materials Science and Engineering, Hefei University of Technology, Hefei 230009 (China); Luo, Guang-Nan [Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031 (China); Zhu, Xiao-Yong; Cheng, Ji-Gui; Wu, Yu-Cheng [School of Materials Science and Engineering, Hefei University of Technology, Hefei 230009 (China); Engineering Research Center of Powder Metallurgy of Anhui Province, Hefei 230009 (China)

    2014-11-15

    Highlights: • Wet chemical method was used to prepare highly uniform Pr{sub 2}O{sub 3} doped W–Pr{sub 2}O{sub 3} powder. • The Pr{sub 2}O{sub 3} particles significantly refine the grain size of tungsten alloy. • The tensile strength of Pr{sub 2}O{sub 3}/W samples were higher than those of pure W samples. - Abstract: Pr{sub 2}O{sub 3} doped W composite were synthesized by a novel wet chemical method and spark plasma sintering. The grain size, relative density and the Vicker hardness HV{sub 0.2} of Pr{sub 2}O{sub 3}/W samples were 4 μm, 98.3% and 377.2, respectively. The tensile strength values of Pr{sub 2}O{sub 3}/W were higher than those of pure W. As the temperature rises from 25 °C to 800 °C, the conductivity of pure W and W–1 wt% Pr{sub 2}O{sub 3} composites decreased with the same trend, was above 150 W/m K.

  14. Growth of graphene on Cu foils by microwave plasma chemical vapor deposition: The effect of in-situ hydrogen plasma post-treatment

    Science.gov (United States)

    Fang, Liping; Yuan, Wen; Wang, Bing; Xiong, Ying

    2016-10-01

    Microwave plasma chemical vapor deposition (MPCVD) is a promising method for the large-scale production of high-quality graphene. The aim of this work is to investigate the effect of in-situ hydrogen plasma post-treatment on the MPCVD-grown graphene films. By simply varying the duration time of in-situ hydrogen plasma, surface morphology, number of layers and defect density of as-grown graphene films can be manipulated. The role of hydrogen plasma can be proposed from our observations, promoting to further grow graphene films in the early stage and consequently acting as an etching agent to thin graphene films in the later stage. On the basis of above mechanism, monolayer graphene films with low defect density and smooth surface can be grown by adjusting the times of the growing step and the plasma post-treatment step. This additional in-situ hydrogen plasma post-treatment may be significant for growing well-defined graphene films with controllable defects and number of layers.

  15. Characteristics of silicon nitride deposited by VHF (162 MHz)-plasma enhanced chemical vapor deposition using a multi-tile push-pull plasma source

    Science.gov (United States)

    Kim, Ki Seok; Sirse, Nishant; Kim, Ki Hyun; Rogers Ellingboe, Albert; Kim, Kyong Nam; Yeom, Geun Young

    2016-10-01

    To prevent moisture and oxygen permeation into flexible organic electronic devices formed on substrates, the deposition of an inorganic diffusion barrier material such as SiN x is important for thin film encapsulation. In this study, by a very high frequency (162 MHz) plasma-enhanced chemical vapor deposition (VHF-PECVD) using a multi-tile push-pull plasma source, SiN x layers were deposited with a gas mixture of NH3/SiH4 with/without N2 and the characteristics of the plasma and the deposited SiN x film as the thin film barrier were investigated. Compared to a lower frequency (60 MHz) plasma, the VHF (162 MHz) multi-tile push-pull plasma showed a lower electron temperature, a higher vibrational temperature, and higher N2 dissociation for an N2 plasma. When a SiN x layer was deposited with a mixture of NH3/SiH4 with N2 at a low temperature of 100 °C, a stoichiometric amorphous Si3N4 layer with very low Si-H bonding could be deposited. The 300 nm thick SiN x film exhibited a low water vapor transmission rate of 1.18  ×  10-4 g (m2 · d)-1, in addition to an optical transmittance of higher than 90%.

  16. Comparison of some effects of modification of a polylactide surface layer by chemical, plasma, and laser methods

    Energy Technology Data Exchange (ETDEWEB)

    Moraczewski, Krzysztof, E-mail: kmm@ukw.edu.pl [Department of Materials Engineering, Kazimierz Wielki University, Department of Materials Engineering, ul. Chodkiewicza 30, 85-064 Bydgoszcz (Poland); Rytlewski, Piotr [Department of Materials Engineering, Kazimierz Wielki University, Department of Materials Engineering, ul. Chodkiewicza 30, 85-064 Bydgoszcz (Poland); Malinowski, Rafał [Institute for Engineering of Polymer Materials and Dyes, ul. M. Skłodowskiej–Curie 55, 87-100 Toruń (Poland); Żenkiewicz, Marian [Department of Materials Engineering, Kazimierz Wielki University, Department of Materials Engineering, ul. Chodkiewicza 30, 85-064 Bydgoszcz (Poland)

    2015-08-15

    Highlights: • We modified polylactide surface layer with chemical, plasma or laser methods. • We tested selected properties and surface structure of modified samples. • We stated that the plasma treatment appears to be the most beneficial. - Abstract: The article presents the results of studies and comparison of selected properties of the modified PLA surface layer. The modification was carried out with three methods. In the chemical method, a 0.25 M solution of sodium hydroxide in water and ethanol was utilized. In the plasma method, a 50 W generator was used, which produced plasma in the air atmosphere under reduced pressure. In the laser method, a pulsed ArF excimer laser with fluency of 60 mJ/cm{sup 2} was applied. Polylactide samples were examined by using the following techniques: scanning electron microscopy (SEM), atomic force microscopy (AFM), goniometry and X-ray photoelectron spectroscopy (XPS). Images of surfaces of the modified samples were recorded, contact angles were measured, and surface free energy was calculated. Qualitative and quantitative analyses of chemical composition of the PLA surface layer were performed as well. Based on the survey it was found that the best modification results are obtained using the plasma method.

  17. Plasma-enhanced chemical vapor deposited silicon oxynitride films for optical waveguide bridges for use in mechanical sensors

    DEFF Research Database (Denmark)

    Storgaard-Larsen, Torben; Leistiko, Otto

    1997-01-01

    In this paper the influence of RF power, ammonia flow, annealing temperature, and annealing time on the optical and mechanical properties of plasma-enhanced chemically vapor deposited silicon oxynitride films, is presented. A low refractive index (1.47 to 1.48) film having tensile stress has been...

  18. Chemical sputtering of graphite by low temperature nitrogen plasmas at various substrate temperatures and ion flux densities

    NARCIS (Netherlands)

    Bystrov, K.; Morgan, T. W.; Tanyeli, I.; De Temmerman, G.; M. C. M. van de Sanden,

    2013-01-01

    We report measurements of chemical sputtering yields of graphite exposed to low temperature nitrogen plasmas. The influence of surface temperature and incoming ion energy on the sputtering yields has been investigated in two distinct ion flux density regimes. Sputtering yields grow consistently with

  19. Relationships between organohalogen contaminants and blood plasma clinical–chemical parameters in chicks of three raptor species from Northern Norway

    DEFF Research Database (Denmark)

    Sonne, Christian; Bustnes, Jan Ove; Herzke, Dorte

    2010-01-01

    Organohalogen contaminants (OHCs) may affect various physiological parameters in birds including blood chemistry. We therefore examined blood plasma clinical-chemical parameters and OHCs in golden eagle, white-tailed eagle and goshawk chicks from Northern Norway. Correlation analyses on pooled da...

  20. Wearable Atmospheric Pressure Plasma Fabrics Produced by Knitting Flexible Wire Electrodes for the Decontamination of Chemical Warfare Agents

    Science.gov (United States)

    Jung, Heesoo; Seo, Jin Ah; Choi, Seungki

    2017-01-01

    One of the key reasons for the limited use of atmospheric pressure plasma (APP) is its inability to treat non-flat, three-dimensional (3D) surface structures, such as electronic devices and the human body, because of the rigid electrode structure required. In this study, a new APP system design—wearable APP (WAPP)—that utilizes a knitting technique to assemble flexible co-axial wire electrodes into a large-area plasma fabric is presented. The WAPP device operates in ambient air with a fully enclosed power electrode and grounded outer electrode. The plasma fabric is flexible and lightweight, and it can be scaled up for larger areas, making it attractive for wearable APP applications. Here, we report the various plasma properties of the WAPP device and successful test results showing the decontamination of toxic chemical warfare agents, namely, mustard (HD), soman (GD), and nerve (VX) agents.

  1. Polyethylene Oxide Films Polymerized by Radio Frequency Plasma-Enhanced Chemical Vapour Phase Deposition and Its Adsorption Behaviour of Platelet-Rich Plasma

    Science.gov (United States)

    Hu, Wen-Juan; Xie, Fen-Yan; Chen, Qiang; Weng, Jing

    2008-10-01

    We present polyethylene oxide (PEO) functional films polymerized by rf plasma-enhanced vapour chemical deposition (rf-PECVD) on p-Si (100) surface with precursor ethylene glycol dimethyl ether (EGDME) and diluted Ar in pulsed plasma mode. The influences of discharge parameters on the film properties and compounds are investigated. The film structure is analysed by Fourier transform infrared (FTIR) spectroscopy. The water contact angle measurement and atomic force microscope (AFM) are employed to examine the surface polarity and to detect surface morphology, respectively. It is concluded that the smaller duty cycle in pulsed plasma mode contributes to the rich C-O-C (EO) group on the surfaces. As an application, the adsorption behaviour of platelet-rich plasma on plasma polymerization films performed in-vitro is explored. The shapes of attached cells are studied in detail by an optic invert microscope, which clarifies that high-density C-O-C groups on surfaces are responsible for non-fouling adsorption behaviour of the PEO films.

  2. Polyethylene Oxide Films Polymerized by Radio Frequency Plasma-Enhanced Chemical Vapour Phase Deposition and Its Adsorption Behaviour of Platelet-Rich Plasma

    Institute of Scientific and Technical Information of China (English)

    HU Wen-Juan; XIE Fen-Yan; CHEN Qiang; WENG Jing

    2008-01-01

    We present polyethylene oxide (PEO) functional films polymerized by rf plasma-enhanced vapour chemical deposition (rf-PECVD) on p-Si (100) surface with precursor ethylene glycol dimethyl ether (EGDME) and diluted Ar in pulsed plasma mode. The influences of discharge parameters on the film properties and compounds are investigated. The film structure is analysed by Fourier transform infrared (FTIR) spectroscopy. The water contact angle measurement and atomic force microscope (AFM) are employed to examine the surface polarity and to detect surface morphology, respectively. It is concluded that the smaller duty cycle in pulsed plasma mode contributes to the rich C-O-C (EO) group on the surfaces. As an application, the adsorption behaviour of platelet-rich plasma on plasma polymerization films performed in-vitro is explored. The shapes of attached cells are studied in detail by an optic invert microscope, which clarifies that high-density C-O-C groups on surfaces are responsible for non-fouling adsorption behaviour of the PEO films.

  3. Selective adhesion of intestinal epithelial cells on patterned films with amine functionalities formed by plasma enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Kyung Seop; Choi, Changrok; Kim, Soo Heon; Choi, Kun oh [Department of Physics, Brain Korea 21 Physics Research Division and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Kim, Jeong Min [Department of Molecular Biology and Institute of Nanosensor and Biotechnology, BK21 Graduate Program for RNA Biology, Dankook University, Yongin 448-701 (Korea, Republic of); Kim, Hong Ja [Department of Internal Medicine, Dankook University College of Medicine, Cheonan 330-715 (Korea, Republic of); Yeo, Sanghak [R and D Center, ELBIO Incorporation, 426-5 Gasan-dong Geumchun-gu, Seoul (Korea, Republic of); Park, Heonyong [Department of Molecular Biology and Institute of Nanosensor and Biotechnology, BK21 Graduate Program for RNA Biology, Dankook University, Yongin 448-701 (Korea, Republic of); Jung, Donggeun, E-mail: djung@skku.ac.kr [Department of Physics, Brain Korea 21 Physics Research Division and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)

    2010-11-01

    Control of cell adhesion to surfaces is important to develop analytical tools in the areas of biomedical engineering. To control cell adhesiveness of the surface, we constructed a variety of plasma polymerized hexamethyldisiloxane (PPHMDSO) thin films deposited at the plasma power range of 10-100 W by plasma enhanced chemical vapor deposition (PECVD). The PPHMDSO film that was formed at 10 W was revealed to be resistant to cell adhesion. The resistance to cell adhesion is closely related to physicochemical properties of the film. Atomic force microscopic data show an increase in surface roughness from 0.52 nm to 0.74 nm with increasing plasma power. From Fourier transform infrared (FT-IR) absorption spectroscopy data, it was also determined that the methyl (-CH{sub 3}) peak intensity increases with increasing plasma power, whereas the hydroxyl (-OH) peak decreases. X-ray photoelectron spectroscopy data reveal an increase in C-O bonding with increasing plasma power. These results suggest that C-O bonding and hydroxyl (-OH) and methyl (-CH{sub 3}) functional groups play a critical part in cell adhesion. Furthermore, to enhance a diversity of film surface, we accumulated the patterned plasma polymerized ethylenediamine (PPEDA) thin film on the top of the PPHMDSO thin film. The PPEDA film is established to be strongly cell-adherent. This patterned two-layer film stacking method can be used to form the selectively limited cell-adhesive PPEDA spots over the adhesion-resistant surface.

  4. Si-nanocrystal-based LEDs fabricated by ion implantation and plasma-enhanced chemical vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Peralvarez, M; Carreras, Josep; Navarro-Urrios, D; Lebour, Y; Garrido, B [MIND, IN2UB, Department of Electronics, University of Barcelona, C/Marti i Franques 1, PL2, E-08028 Barcelona (Spain); Barreto, J; DomInguez, C [IMB-CNM, CSIC, Bellaterra, E-08193 Barcelona (Spain); Morales, A, E-mail: mperalvarez@el.ub.e [INAOE, Electronics Department, Apartado 51, Puebla 72000 (Mexico)

    2009-10-07

    An in-depth study of the physical and electrical properties of Si-nanocrystal-based MOSLEDs is presented. The active layers were fabricated with different concentrations of Si by both ion implantation and plasma-enhanced chemical vapour deposition. Devices fabricated by ion implantation exhibit a combination of direct current and field-effect luminescence under a bipolar pulsed excitation. The onset of the emission decreases with the Si excess from 6 to 3 V. The direct current emission is attributed to impact ionization and is associated with the reasonably high current levels observed in current-voltage measurements. This behaviour is in good agreement with transmission electron microscopy images that revealed a continuous and uniform Si nanocrystal distribution. The emission power efficiency is relatively low, {approx}10{sup -3}%, and the emission intensity exhibits fast degradation rates, as revealed from accelerated ageing experiments. Devices fabricated by chemical deposition only exhibit field-effect luminescence, whose onset decreases with the Si excess from 20 to 6 V. The absence of the continuous emission is explained by the observation of a 5 nm region free of nanocrystals, which strongly reduces the direct current through the gate. The main benefit of having this nanocrystal-free region is that tunnelling current flow assisted by nanocrystals is blocked by the SiO{sub 2} stack so that power consumption is strongly reduced, which in return increases the device power efficiency up to 0.1%. In addition, the accelerated ageing studies reveal a 50% degradation rate reduction as compared to implanted structures.

  5. Plasma enhanced chemical vapor deposition of iron doped thin dioxide films, their structure and photowetting effect

    Energy Technology Data Exchange (ETDEWEB)

    Sobczyk-Guzenda, A., E-mail: anna.sobczyk-guzenda@p.lodz.pl [Institute of Materials Science and Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Lodz (Poland); Owczarek, S.; Szymanowski, H. [Institute of Materials Science and Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Lodz (Poland); Wypych-Puszkarz, A. [Department of Molecular Physics, Lodz University of Technology, Zeromskiego 116, 90-924 Lodz (Poland); Volesky, L. [Technical University of Liberec, Institute for Nanomaterials, Advanced Technologies and Innovation, Studentska 1402/2, 461 17 Liberec 1 (Czech Republic); Gazicki-Lipman, M. [Institute of Materials Science and Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Lodz (Poland)

    2015-08-31

    Radio frequency plasma enhanced chemical vapor deposition (RF PECVD) technique was applied for the purpose of deposition of iron doped titanium dioxide coatings from a gaseous mixture of oxygen with titanium (IV) chloride and iron (0) pentacarbonyl. Glass slides and silicon wafers were used as substrates. The coatings morphology was investigated using scanning electron microscopy (SEM) and atomic force microscopy (AFM). Their elemental and chemical composition was studied with the help of X-ray energy dispersive spectroscopy (EDS) and Fourier transform infrared (FTIR) spectroscopy, respectively, while their phase composition was analyzed with the Raman spectroscopy. For the determination of the film optical properties, ultraviolet (UV–Vis) spectroscopy techniques were used. Iron content in the range of 0.07 to 11.5 at.% was found in the coatings. FTIR studies showed that iron was built-in in the structure of TiO{sub 2} matrix. Surface roughness, assessed with the SEM and AFM techniques, increases with an increasing content of this element. Trace amounts of iron resulted in a lowering of an absorption threshold of the films and their optical gap, but the tendency was reversed for high concentrations of that element. The effect of iron doping on UV photowettability of the films was also studied and, for coatings containing up to 5% of iron, it was stronger than that exhibited by pure TiO{sub 2}. - Highlights: • Iron doped TiO{sub 2} films were deposited with the PECVD method. • Differences of surface morphology of the films with different iron content were shown. • Depending on the iron content, the film structure is either amorphous or crystalline. • A parabolic character of the optical gap dependence on the concentration of iron was observed. • Up to a concentration of 5% of iron, doped TiO{sub 2} films exhibit a super-hydrophilic effect.

  6. Gettering of interstitial iron in silicon by plasma-enhanced chemical vapour deposited silicon nitride films

    Science.gov (United States)

    Liu, A. Y.; Sun, C.; Markevich, V. P.; Peaker, A. R.; Murphy, J. D.; Macdonald, D.

    2016-11-01

    It is known that the interstitial iron concentration in silicon is reduced after annealing silicon wafers coated with plasma-enhanced chemical vapour deposited (PECVD) silicon nitride films. The underlying mechanism for the significant iron reduction has remained unclear and is investigated in this work. Secondary ion mass spectrometry (SIMS) depth profiling of iron is performed on annealed iron-contaminated single-crystalline silicon wafers passivated with PECVD silicon nitride films. SIMS measurements reveal a high concentration of iron uniformly distributed in the annealed silicon nitride films. This accumulation of iron in the silicon nitride film matches the interstitial iron loss in the silicon bulk. This finding conclusively shows that the interstitial iron is gettered by the silicon nitride films during annealing over a wide temperature range from 250 °C to 900 °C, via a segregation gettering effect. Further experimental evidence is presented to support this finding. Deep-level transient spectroscopy analysis shows that no new electrically active defects are formed in the silicon bulk after annealing iron-containing silicon with silicon nitride films, confirming that the interstitial iron loss is not due to a change in the chemical structure of iron related defects in the silicon bulk. In addition, once the annealed silicon nitride films are removed, subsequent high temperature processes do not result in any reappearance of iron. Finally, the experimentally measured iron decay kinetics are shown to agree with a model of iron diffusion to the surface gettering sites, indicating a diffusion-limited iron gettering process for temperatures below 700 °C. The gettering process is found to become reaction-limited at higher temperatures.

  7. Microwave Plasma Chemical Vapor Deposition of Diamond Films on Silicon From Ethanol and Hydrogen

    Institute of Scientific and Technical Information of China (English)

    马志斌; 汪建华; 王传新; 满卫东

    2003-01-01

    Diamond films with very smooth surface and good optical quality have been deposited onto silicon substrate using microwave plasma chemical vapor deposition (MPCVD) from a gas mixture of ethanol and hydrogen at a low substrate temperature of 450 ℃. The effects of the substrate temperature on the diamond nucleation and the morphology of the diamond film have been investigated and observed with scanning electron microscopy (SEM). The microstructure and the phase of the film have been characterized using Raman spectroscopy and X-ray diffraction (XRD). The diamond nucleation density significantly decreases with the increasing of the substrate temperature. There are only sparse nuclei when the substrate temperature is higher than 800 ℃ although the ethanol concentration in hydrogen is very high. That the characteristic diamond peak in the Raman spectrum of a diamond film prepared at a low substrate temperature of 450 ℃ extends into broadband indicates that the film is of nanophase. No graphite peak appeared in the XRD pattern confirms that the film is mainly composed of SP3 carbon. The diamond peak in the XRD pattern also broadens due to the nanocrystalline of the film.

  8. Analytical estimation of particle shape formation parameters in a plasma-chemical reactor

    Directory of Open Access Journals (Sweden)

    Zhukov Ilya A.

    2017-01-01

    Full Text Available Analytical estimation of particle shape formation parameters in a plasma-chemical reactor implementing the process of thermochemical decomposition of liquid droplet agents (precursors in the flow of a high-temperature gaseous heat-transfer medium was obtained. The basic factor which determines the process is the increase of concentration of a dissolved salt precursor component at the surface of a liquid particle due to solvent evaporation. According to the physical concept of the method of integral balance the diffusion process of concentration change is divided into two stages: the first stage is when the size of gradient layer does not reach the center of a spherical droplet and the second stage when the concentration at the center of a liquid droplet begins to change. The solutions for concentration fields were found for each stage using the method of integral balance taking into account the formation of salt precipitate when the concentration at the surface of the droplet reaches certain equilibrium value. The results of estimation of the influence of various reactor operation parameters and characteristics of initial solution (precursor on the morphology of particles formed – mass fraction and localization of salt precipitate for various levels of evaporation.

  9. Nanostructured silicon carbon thin films grown by plasma enhanced chemical vapour deposition technique

    Energy Technology Data Exchange (ETDEWEB)

    Coscia, U. [Dipartimento di Fisica, Università di Napoli “Federico II” Complesso Universitario MSA, via Cinthia, 80126 Napoli (Italy); CNISM Unita' di Napoli, Complesso Universitario MSA, via Cinthia, 80126 Napoli (Italy); Ambrosone, G., E-mail: ambrosone@na.infn.it [Dipartimento di Fisica, Università di Napoli “Federico II” Complesso Universitario MSA, via Cinthia, 80126 Napoli (Italy); SPIN-CNR, Complesso Universitario MSA, via Cinthia, 80126 Napoli (Italy); Basa, D.K. [Department of Physics, Utkal University, Bhubaneswar 751004 (India); Rigato, V. [INFN Laboratori Nazionali Legnaro, 35020 Legnaro (Padova) (Italy); Ferrero, S.; Virga, A. [Dipartimento di Scienza Applicata e Tecnologia, Politecnico di Torino, C.so Duca degli Abruzzi 24, 10129 Torino (Italy)

    2013-09-30

    Nanostructured silicon carbon thin films, composed of Si nanocrystallites embedded in hydrogenated amorphous silicon carbon matrix, have been prepared by varying rf power in ultra high vacuum plasma enhanced chemical vapour deposition system using silane and methane gas mixtures diluted in hydrogen. In this paper we have studied the compositional, structural and electrical properties of these films as a function of rf power. It is shown that with increasing rf power the atomic densities of carbon and hydrogen increase while the atomic density of silicon decreases, resulting in a reduction in the mass density. Further, it is demonstrated that carbon is incorporated into amorphous matrix and it is mainly bonded to silicon. The study has also revealed that the crystalline volume fraction decreases with increase in rf power and that the films deposited with low rf power have a size distribution of large and small crystallites while the films deposited with relatively high power have only small crystallites. Finally, the enhanced transport properties of the nanostructured silicon carbon films, as compared to amorphous counterpart, have been attributed to the presence of Si nanocrystallites. - Highlights: • The mass density of silicon carbon films decreases from 2.3 to 2 g/cm{sup 3}. • Carbon is incorporated in the amorphous phase and it is mainly bonded to silicon. • Nanostructured silicon carbon films are deposited at rf power > 40 W. • Si nanocrystallites in amorphous silicon carbon enhance the electrical properties.

  10. Characterization of diamond-like nanocomposite thin films grown by plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Santra, T. S.; Liu, C. H.; Bhattacharyya, T. K.; Patel, P.; Barik, T. K.

    2010-06-01

    Diamond-like nanocomposite (DLN) thin films, comprising the networks of a-C:H and a-Si:O were deposited on pyrex glass or silicon substrate using gas precursors (e.g., hexamethyldisilane, hexamethyldisiloxane, hexamethyldisilazane, or their different combinations) mixed with argon gas, by plasma enhanced chemical vapor deposition technique. Surface morphology of DLN films was analyzed by atomic force microscopy. High-resolution transmission electron microscopic result shows that the films contain nanoparticles within the amorphous structure. Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to determine the structural change within the DLN films. The hardness and friction coefficient of the films were measured by nanoindentation and scratch test techniques, respectively. FTIR and XPS studies show the presence of CC, CH, SiC, and SiH bonds in the a-C:H and a-Si:O networks. Using Raman spectroscopy, we also found that the hardness of the DLN films varies with the intensity ratio ID/IG. Finally, we observed that the DLN films has a better performance compared to DLC, when it comes to properties like high hardness, high modulus of elasticity, low surface roughness and low friction coefficient. These characteristics are the critical components in microelectromechanical systems (MEMS) and emerging nanoelectromechanical systems (NEMS).

  11. Electrical transport properties of graphene nanowalls grown at low temperature using plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Zhao, Rong; Ahktar, Meysam; Alruqi, Adel; Dharmasena, Ruchira; Jasinski, Jacek B.; Thantirige, Rukshan M.; Sumanasekera, Gamini U.

    2017-05-01

    In this work, we report the electrical transport properties of uniform and vertically oriented graphene (graphene nanowalls) directly synthesized on multiple substrates including glass, Si/SiO2 wafers, and copper foils using radio-frequency plasma enhanced chemical vapor deposition (PECVD) with methane (CH4) as the precursor at relatively low temperatures. The temperature for optimum growth was established with the aid of transmission electron microscopy, scanning electron microscopy, and Raman spectroscopy. This approach offers means for low-cost graphene nanowalls growth on an arbitrary substrate with the added advantage of transfer-free device fabrication. The temperature dependence of the electrical transport properties (resistivity and thermopower) were studied in the temperature range, 30-300 K and analyzed with a combination of 2D-variable range hopping (VRH) and thermally activated (TA) conduction mechanisms. An anomalous temperature dependence of the thermopower was observed for all the samples and explained with a combination of a diffusion term having a linear temperature dependence plus a term with an inverse temperature dependence.

  12. Synthesis of thick diamond films by direct current hot-cathode plasma chemical vapour deposition

    CERN Document Server

    Jin Zeng Sun; Bai Yi Zhen; Lu Xian Yi

    2002-01-01

    The method of direct current hot-cathode plasma chemical vapour deposition has been established. A long-time stable glow discharge at large discharge current and high gas pressure has been achieved by using a hot cathode in the temperature range from 1100 degree C to 1500 degree C and non-symmetrical configuration of the poles, in which the diameter of the cathode is larger than that of anode. High-quality thick diamond films, with a diameter of 40-50 mm and thickness of 0.5-4.2 mm, have been synthesized by this method. Transparent thick diamond films were grown over a range of growth rates between 5-10 mu m/h. Most of the thick diamond films have thermal conductivities of 10-12 W/K centre dot cm. The thick diamond films with high thermal conductivity can be used as a heat sink of semiconducting laser diode array and as a heat spreading and isolation substrate of multichip modules. The performance can be obviously improved

  13. FTIR Characterization of Fluorine Doped Silicon Dioxide Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition

    Institute of Scientific and Technical Information of China (English)

    WANG Peng-Fei; DING Shi-Jin; ZHANG Wei; ZHANG Jian-Yun; WANGJi-Tao; WEI William Lee

    2000-01-01

    Fluorine doped silicon dioxide (SiOF) thin films have been prepared by plasma enhanced chemical vapor depo sition. The Fourier transform infrared spectrometry (FTIR) spectra of SiOF films are deliberated to reveal the structure change of SiO2 and the mechanism of dielectric constant reduction after doping fluorine. When F is doped in SiO2 films, the Si-O stretching absorption peak will have a blue-shift due to increase of the partial charge of the O atom. The FTIR spectra indicate that some Si-OH components in the thin film can be removed after doping fluorine. These changes reduce the ionic and orientational polarization, and result in the reduction in dielectric constant of the film. According to Gaussian fitting, it is found that the Si-F2 bonds will appear in the SiOF film with increase of the fluorine content. The Si-F2 structures are liable to react with water, and cause the same increase of absorbed moisture in the film.

  14. Chain Assemblies from Nanoparticles Synthesized by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition: The Computational View.

    Science.gov (United States)

    Mishin, Maxim V; Zamotin, Kirill Y; Protopopova, Vera S; Alexandrov, Sergey E

    2015-12-01

    This article refers to the computational study of nanoparticle self-organization on the solid-state substrate surface with consideration of the experimental results, when nanoparticles were synthesised during atmospheric pressure plasma enhanced chemical vapor deposition (AP-PECVD). The experimental study of silicon dioxide nanoparticle synthesis by AP-PECVD demonstrated that all deposit volume consists of tangled chains of nanoparticles. In certain cases, micron-sized fractals are formed from tangled chains due to deposit rearrangement. This work is focused on the study of tangled chain formation only. In order to reveal their formation mechanism, a physico-mathematical model was developed. The suggested model was based on the motion equation solution for charged and neutral nanoparticles in the potential fields with the use of the empirical interaction potentials. In addition, the computational simulation was carried out based on the suggested model. As a result, the influence of such experimental parameters as deposition duration, particle charge, gas flow velocity, and angle of gas flow was found. It was demonstrated that electrical charges carried by nanoparticles from the discharge area are not responsible for the formation of tangled chains from nanoparticles, whereas nanoparticle kinetic energy plays a crucial role in deposit morphology and density. The computational results were consistent with experimental results.

  15. Growth of nanocrystalline silicon carbide thin films by plasma enhanced chemical vapor deposition

    CERN Document Server

    Lee, S W; Moon, J Y; Ahn, S S; Kim, H Y; Shin, D H

    1999-01-01

    Nanocrystalline silicon carbide thin films have been deposited by plasma enhanced chemical vapor deposition (PECVD) using SiH sub 4 , CH sub 4 , and H sub 2 gases. The effects of gas mixing ratio (CH sub 4 /SiH sub 4), deposition temperature, and RF power on the film properties have been studied. The growth rate, refractive index, and the optical energy gap depends critically on the growth conditions. The dependence of the growth rate on the gas flow ratio is quite different from the results obtained for the growth using C sub 2 H sub 2 gas instead of CH sub 4. As the deposition temperature is increased from 300 .deg. C to 600 .deg. C, hydrogen and carbon content in the film decreases and as a result the optical gap decreases. At the deposition temperature of 600 .deg. C and RF power of 150 W, the film structure si nanocrystalline, As the result of the nanocrystallization the dark conductivity is greatly improved. The nanocrystalline silicon carbide thin films may be used for large area optoelectronic devices...

  16. Boron nitride nanowalls: low-temperature plasma-enhanced chemical vapor deposition synthesis and optical properties

    Science.gov (United States)

    Merenkov, Ivan S.; Kosinova, Marina L.; Maximovskii, Eugene A.

    2017-05-01

    Hexagonal boron nitride (h-BN) nanowalls (BNNWs) were synthesized by plasma-enhanced chemical vapor deposition (PECVD) from a borazine (B3N3H6) and ammonia (NH3) gas mixture at a low temperature range of 400 °C-600 °C on GaAs(100) substrates. The effect of the synthesis temperature on the structure and surface morphology of h-BN films was investigated. The length and thickness of the h-BN nanowalls were in the ranges of 50-200 nm and 15-30 nm, respectively. Transmission electron microscope images showed the obtained BNNWs were composed of layered non-equiaxed h-BN nanocrystallites 5-10 nm in size. The parallel-aligned h-BN layers as an interfacial layer were observed between the film and GaAs(100) substrate. BNNWs demonstrate strong blue light emission, high transparency (>90%) both in visible and infrared spectral regions and are promising for optical applications. The present results enable a convenient growth of BNNWs at low temperatures.

  17. Wetting behaviour of carbon nitride nanostructures grown by plasma enhanced chemical vapour deposition technique

    Science.gov (United States)

    Ahmad Kamal, Shafarina Azlinda; Ritikos, Richard; Abdul Rahman, Saadah

    2015-02-01

    Tuning the wettability of various coating materials by simply controlling the deposition parameters is essential for various specific applications. In this work, carbon nitride (CNx) films were deposited on silicon (1 1 1) substrates using radio-frequency plasma enhanced chemical vapour deposition employing parallel plate electrode configuration. Effects of varying the electrode distance (DE) on the films' structure and bonding properties were investigated using Field emission scanning electron microscopy, Atomic force microscopy, Fourier transform infrared and X-ray photoemission spectroscopy. The wettability of the films was analyzed using water contact angle measurements. At high DE, the CNx films' surface was smooth and uniform. This changed into fibrous nanostructures when DE was decreased. Surface roughness of the films increased with this morphological transformation. Nitrogen incorporation increased with decrease in DE which manifested the increase in both relative intensities of Cdbnd N to Cdbnd C and Nsbnd H to Osbnd H bonds. sp2-C to sp3-C ratio increased as DE decreased due to greater deformation of sp2 bonded carbon at lower DE. The films' characteristics changed from hydrophilic to super-hydrophobic with the decrease in DE. Roughness ratio, surface porosity and surface energy calculated from contact angle measurements were strongly dependent on the morphology, surface roughness and bonding properties of the films.

  18. Stress control of silicon nitride films deposited by plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Li, Dong-ling; Feng, Xiao-fei; Wen, Zhi-yu; Shang, Zheng-guo; She, Yin

    2016-07-01

    Stress controllable silicon nitride (SiNx) films deposited by plasma enhanced chemical vapor deposition (PECVD) are reported. Low stress SiNx films were deposited in both high frequency (HF) mode and dual frequency (HF/LF) mode. By optimizing process parameters, stress free (-0.27 MPa) SiNx films were obtained with the deposition rate of 45.5 nm/min and the refractive index of 2.06. Furthermore, at HF/LF mode, the stress is significantly influenced by LF ratio and LF power, and can be controlled to be 10 MPa with the LF ratio of 17% and LF power of 150 W. However, LF power has a little effect on the deposition rate due to the interaction between HF power and LF power. The deposited SiNx films have good mechanical and optical properties, low deposition temperature and controllable stress, and can be widely used in integrated circuit (IC), micro-electro-mechanical systems (MEMS) and bio-MEMS.

  19. Integration of plasma-assisted surface chemical modification, soft lithography, and protein surface activation for single-cell patterning

    Science.gov (United States)

    Cheng, Q.; Komvopoulos, K.

    2010-07-01

    Surface patterning for single-cell culture was accomplished by combining plasma-assisted surface chemical modification, soft lithography, and protein-induced surface activation. Hydrophilic patterns were produced on Parylene C films deposited on glass substrates by oxygen plasma treatment through the windows of polydimethylsiloxane shadow masks. After incubation first with Pluronic F108 solution and then serum medium overnight, surface seeding with mesenchymal stem cells in serum medium resulted in single-cell patterning. The present method provides a means of surface patterning with direct implications in single-cell culture.

  20. Measurement of electron temperatures of Argon Plasmas in a High-Density Inductively-Coupled Remote Plasma System by Langmuir Probe and Optical-Emission Spectroscopy

    NARCIS (Netherlands)

    Boogaard, A.; Kovalgin, Alexeij Y.; Aarnink, Antonius A.I.; Wolters, Robertus A.M.; Holleman, J.; Brunets, I.; Schmitz, Jurriaan

    2006-01-01

    We measured electron density and electron energy distribution function (EEDF) in our reactor by a Langmuir probe. The EEDF of Ar plasma in the reactor could largely be described by the Maxwell-Boltzmann distribution function, but it also contained a fraction (~10-3) of electrons which were much

  1. Dilepton production as a useful probe of quark gluon plasma with temperature dependent chemical potential quark mass

    Science.gov (United States)

    Kumar, Yogesh; Singh, S. Somorendro

    2016-07-01

    We extend the previous study of dilepton production using [S. Somorendro Singh and Y. Kumar, Can. J. Phys. 92 (2014) 31] based on a simple quasiparticle model of quark-gluon plasma (QGP). In this model, finite value of quark mass uses temperature dependent chemical potential the so-called Temperature Dependent Chemical Potential Quark Mass (TDCPQM). We calculate dilepton production in the relevant range of mass region. It is observed that the production rate is marginally enhanced from the earlier work. This is due to the effect of TDCPQM and its effect is highly significant in the production of dilepton.

  2. The influence of plasma technology coupled to chemical grafting on the cell growth compliance of 3D hydroxyapatite scaffolds.

    Science.gov (United States)

    Russo, Laura; Zanini, Stefano; Giannoni, Paolo; Landi, Elena; Villa, Anna; Sandri, Monica; Riccardi, Claudia; Quarto, Rodolfo; Doglia, Silvia M; Nicotra, Francesco; Cipolla, Laura

    2012-11-01

    The development of advanced materials with biomimetic features in order to elicit desired biological responses and to guarantee tissue biocompatibility is recently gaining attention for tissue engineering applications. Bioceramics, such as hydroxyapatite-based biomaterials are now used in a number of different applications throughout the body, covering all areas of the skeleton, due to their biological and chemical similarity to the inorganic phases of bones. When bioactive sintered hydroxyapatite (HA) is desired, biomolecular modification of these materials is needed. In the present work, we investigated the influence of plasma surface modification coupled to chemical grafting on the cell growth compliance of HA 3D scaffolds.

  3. Raman spectra investigation of the defects of chemical vapor deposited multilayer graphene and modified by oxygen plasma treatment

    Science.gov (United States)

    Li, Zongyao; Xu, Yu; Cao, Bing; Qi, Lin; He, Shunyu; Wang, Chinhua; Zhang, Jicai; Wang, Jianfeng; Xu, Ke

    2016-11-01

    Graphene, a two dimensional material, can be modified its properties by defects engineering. Here, we present Raman spectra studies of the multilayer graphene (MLG) fabricated by low-pressure chemical vapor deposition over copper foil, and report that the defects of MLG can be controlled by adjusting methane concentration. Moreover, MLG can be changed from metallic to semiconductoring properties by using oxygen plasma treatment, and we investigate the defects evolution of the graphene after exposing to oxygen plasma by Raman spectra. Our results indicate that the amount of defects in graphene can be changed by regulating the methane concentration and oxygen plasma exposure times, but the primary type of defect in MLG is still boundary-like defect. It is valuable for understanding the physics of defects evolution through artificially generated defects, and such defect engineering will greatly open up the future application of the novel material.

  4. Microwave processing of epoxy resins and synthesis of carbon nanotubes by microwave plasma chemical vapor deposition

    Science.gov (United States)

    Zong, Liming

    Microwave processing of advanced materials has been studied as an attractive alternative to conventional thermal processing. In this dissertation, work was preformed in four sections. The first section is a review on research status of microwave processing of polymer materials. The second section is investigation of the microwave curing kinetics of epoxy resins. The curing of diglycidyl ether of bisphenol A (DGEBA) and 3, 3'-diaminodiphenyl sulfone (DDS) system under microwave radiation at 145 °C was governed by an autocatalyzed reaction mechanism. A kinetic model was used to describe the curing progress. The third section is a study on dielectric properties of four reacting epoxy resins over a temperature range at 2.45 GHz. The epoxy resin was DGEBA. The four curing agents were DDS, Jeffamine D-230, m-phenylenediamine, and diethyltoluenediamine. The mixtures of DGEBA and the four curing agents were stoichiometric. The four reacting systems were heated under microwave irradiation to certain cure temperatures. Measurements of temperature and dielectric properties were made during free convective cooling of the samples. The cooled samples were analyzed with a Differential Scanning Calorimeter to determine the extents of cure. The Davidson-Cole model can be used to describe the dielectric data. A simplified Davidson-Cole expression was proposed to calculate the parameters in the Davidson-Cole model and describe the dielectric properties of the DGEBA/DDS system and part of the dielectric data of the other three systems. A single relaxation model was used with the Arrhenius expression for temperature dependence to model the results. The evolution of all parameters in the models during cure was related to the decreasing number of the epoxy and amine groups in the reactants and the increasing viscosity of the reacting systems. The last section is synthesis of carbon nanotubes (CNTs) on silicon substrate by microwave plasma chemical vapor deposition of a gas mixture of

  5. Lab-on-a-chip reactor imaging with unprecedented chemical resolution by Hadamard-encoded remote detection NMR.

    Science.gov (United States)

    Telkki, Ville-Veikko; Zhivonitko, Vladimir V; Selent, Anne; Scotti, Gianmario; Leppäniemi, Jarmo; Franssila, Sami; Koptyug, Igor V

    2014-10-13

    The development of microfluidic processes requires information-rich detection methods. Here we introduce the concept of remote detection exchange NMR spectroscopy (RD-EXSY), and show that, along with indirect spatial information extracted from time-of-flight data, it provides unique information about the active regions, reaction pathways, and intermediate products in a lab-on-a-chip reactor. Furthermore, we demonstrate that direct spatial resolution can be added to RD-EXSY efficiently by applying the principles of Hadamard spectroscopy.

  6. Small scale experiment on the plasma assisted thermal chemical preparation and combustion of pulverized coal

    Energy Technology Data Exchange (ETDEWEB)

    Masaya, Sugimoto; Koichi, Takeda [Akita Prefectural University (Japan); Solonenko, O.P. [Institute of Theoretical and Applied Mechanics, Novosibirsk (Russian Federation); Sakashita, M.; Nakamura, M. [Japan Technical Information Service, Tokyo (Japan)

    2001-07-01

    Ignition and stable combustion of pulverized coal with Nitrogen and Air plasmas are investigated experimentally for some different types of coal. The experimental results show that air plasma has strong effect for ignition and stabilization of coal combustion. In addition, suppression of NO{sub x} production could be possible even in air plasma. It is possible to ignite and burn stably for the inferior coal that contains volatile matter in the ratio of only 10% of dry total mass. (authors)

  7. Physico Chemical Characteristics of High Performance Polymer Modified by Low and Atmospheric Pressure Plasma1

    OpenAIRE

    N Bhatnagar; Jha, S.; Bhowmik, S.; Gupta, G.; Moon, J.B.; Kim, C.G.

    2012-01-01

    In this work, the effect of low pressure plasma and atmospheric-pressure plasma treatment on surface properties and adhesion characteristics of high performance polymer, Polyether Ether Ketone (PEEK) are investigated in terms of Fourier Transform Infrared Spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and Atomic Force Microscopy (AFM). The experimental results show that the PEEK surface treated by atmospheric pressure plasma lead to an increase in the polar component of the surf...

  8. Physico-chemical characteristics of high performance polymer modified by low and atmospheric pressure plasma

    OpenAIRE

    Nitu, Bhatnagar; Sangeeta, Jha; Shantanu, Bhowmik; Govind, Gupta; Moon, J.; Kim, C

    2012-01-01

    In this work, the effect of low pressure plasma and atmospheric-pressure plasma treatment on surface properties and adhesion characteristics of high performance polymer, Polyether Ether Ketone (PEEK) are investigated in terms of Fourier Transform Infrared Spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and Atomic Force Microscopy (AFM). The experimental results show that the PEEK surface treated by atmospheric pressure plasma lead to an increase in the polar component of the surf...

  9. Chemical kinetics and relaxation of non-equilibrium air plasma generated by energetic photon and electron beams

    Science.gov (United States)

    Maulois, Melissa; Ribière, Maxime; Eichwald, Olivier; Yousfi, Mohammed; Azaïs, Bruno

    2016-04-01

    The comprehension of electromagnetic perturbations of electronic devices, due to air plasma-induced electromagnetic field, requires a thorough study on air plasma. In the aim to understand the phenomena at the origin of the formation of non-equilibrium air plasma, we simulate, using a volume average chemical kinetics model (0D model), the time evolution of a non-equilibrium air plasma generated by an energetic X-ray flash. The simulation is undertaken in synthetic air (80% N2 and 20% O2) at ambient temperature and atmospheric pressure. When the X-ray flash crosses the gas, non-relativistic Compton electrons (low energy) and a relativistic Compton electron beam (high energy) are simultaneously generated and interact with the gas. The considered chemical kinetics scheme involves 26 influent species (electrons, positive ions, negative ions, and neutral atoms and molecules in their ground or metastable excited states) reacting following 164 selected reactions. The kinetics model describing the plasma chemistry was coupled to the conservation equation of the electron mean energy, in order to calculate at each time step of the non-equilibrium plasma evolution, the coefficients of reactions involving electrons while the energy of the heavy species (positive and negative ions and neutral atoms and molecules) is assumed remaining close to ambient temperature. It has been shown that it is the relativistic Compton electron beam directly created by the X-ray flash which is mainly responsible for the non-equilibrium plasma formation. Indeed, the low energy electrons (i.e., the non-relativistic ones) directly ejected from molecules by Compton collisions contribute to less than 1% on the creation of electrons in the plasma. In our simulation conditions, a non-equilibrium plasma with a low electron mean energy close to 1 eV and a concentration of charged species close to 1013 cm-3 is formed a few nanoseconds after the peak of X-ray flash intensity. 200 ns after the flash

  10. Distributed chemical computing using ChemStar: an open source java remote method invocation architecture applied to large scale molecular data from PubChem.

    Science.gov (United States)

    Karthikeyan, M; Krishnan, S; Pandey, Anil Kumar; Bender, Andreas; Tropsha, Alexander

    2008-04-01

    We present the application of a Java remote method invocation (RMI) based open source architecture to distributed chemical computing. This architecture was previously employed for distributed data harvesting of chemical information from the Internet via the Google application programming interface (API; ChemXtreme). Due to its open source character and its flexibility, the underlying server/client framework can be quickly adopted to virtually every computational task that can be parallelized. Here, we present the server/client communication framework as well as an application to distributed computing of chemical properties on a large scale (currently the size of PubChem; about 18 million compounds), using both the Marvin toolkit as well as the open source JOELib package. As an application, for this set of compounds, the agreement of log P and TPSA between the packages was compared. Outliers were found to be mostly non-druglike compounds and differences could usually be explained by differences in the underlying algorithms. ChemStar is the first open source distributed chemical computing environment built on Java RMI, which is also easily adaptable to user demands due to its "plug-in architecture". The complete source codes as well as calculated properties along with links to PubChem resources are available on the Internet via a graphical user interface at http://moltable.ncl.res.in/chemstar/.

  11. Physico Chemical Characteristics of High Performance Polymer Modified by Low and Atmospheric Pressure Plasma1

    NARCIS (Netherlands)

    Bhatnagar, N.; Jha, S.; Bhowmik, S.; Gupta, G.; Moon, J.B.; Kim, C.G.

    2012-01-01

    In this work, the effect of low pressure plasma and atmospheric-pressure plasma treatment on surface properties and adhesion characteristics of high performance polymer, Polyether Ether Ketone (PEEK) are investigated in terms of Fourier Transform Infrared Spectroscopy (FTIR), X-ray photoelectron

  12. Physico-mechanical and physico-chemical properties of synthesized cement based on plasma- and wet technologies

    Science.gov (United States)

    Sazonova, Natalya; Skripnikova, Nelli

    2016-01-01

    In this work we studied the influence of plasma-chemical technology of cement clinker synthesis under conditions of high-concentrated heat streams on the properties of cement on fixing such factors as raw-material type (chemical and mineralogical composition), fraction composition, homogenization and module characters of the raw-material mixture. In this connection the sludge of the cement plant in town Angarsk, based on which the cement clinker synthesis using the wet- and plasma-chemical technologies was performed, was used in the studies. The results of chemical X-ray-phase analysis, petrography of cement clinkers, differential scanning colorimetry of hardened cement paste are represented in this work. The analysis of building-technical properties of inorganic viscous substances was performed. It was found that in using the identical raw-material mixture the cement produced with temperature higher by 1650 °C than the traditional one may indicate the higher activity. The hardened cement paste compressive strength at the age of 28 days was higher than the strength of the reference samples by 40.8-41.4 %.

  13. Characteristics of a nickel thin film and formation of nickel silicide by using remote plasma atomic layer deposition with Ni( i Pr-DAD)2

    Science.gov (United States)

    Kim, Jinho; Jang, Woochool; Park, Jingyu; Jeon, Heeyoung; Kim, Hyunjung; Yuh, Junhan; Jeon, Hyeongtag

    2015-03-01

    In this study, the characteristics of nickel thin film deposited by remote plasma atomic layer deposition (RPALD) on p-type Si substrate and formation of nickel silicide using rapid thermal annealing were determined. Bis(1,4-di-isopropyl-1,3-diazabutadienyl)nickel, Ni(iPr-DAD)2, was used as a Ni precursor and ammonia plasma was used as a reactant. This was the first attempt to deposit Ni thin film using Ni(iPr-DAD)2 as a precursor for the ALD process. The RPALD Ni film was deposited with a growth rate of around 2.2{\\AA}/cycle at 250 {\\deg}C and showed significant low resistivity of 33 {\\mu}{\\Omega}cm with a total impurity concentration of around 10 at. %.The impurities of the thin film, carbon and nitrogen, were existent by the forms of C-C and C-N in a bonding state. The impurities removal tendency was investigated by comparing of experimental conditions, namely process temperature and pressure. Nitrogen impurity was removed by thermal desorption during each ALD cycle and carbon impurity was reduced by the optimizing of the process pressure which is directly related with a mean free path of NH3 plasma. After Ni deposition, nickel silicide was formed by RTA in a vacuum ambient for 1 minute. A nickel silicide layer from ALD Ni and PVD Ni was compared at the annealing temperature from 500 to 900 {\\deg}C. NiSi from ALD Ni showed better thermal stability due to the contribution of small amounts of carbon and nitrogen in the asdeposited Ni thin film. Degradation of the silicide layer was effectively suppressed with a use of ALD Ni.

  14. Kinetic mechanism of molecular energy transfer and chemical reactions in low-temperature air-fuel plasmas.

    Science.gov (United States)

    Adamovich, Igor V; Li, Ting; Lempert, Walter R

    2015-08-13

    This work describes the kinetic mechanism of coupled molecular energy transfer and chemical reactions in low-temperature air, H2-air and hydrocarbon-air plasmas sustained by nanosecond pulse discharges (single-pulse or repetitive pulse burst). The model incorporates electron impact processes, state-specific N(2) vibrational energy transfer, reactions of excited electronic species of N(2), O(2), N and O, and 'conventional' chemical reactions (Konnov mechanism). Effects of diffusion and conduction heat transfer, energy coupled to the cathode layer and gasdynamic compression/expansion are incorporated as quasi-zero-dimensional corrections. The model is exercised using a combination of freeware (Bolsig+) and commercial software (ChemKin-Pro). The model predictions are validated using time-resolved measurements of temperature and N(2) vibrational level populations in nanosecond pulse discharges in air in plane-to-plane and sphere-to-sphere geometry; temperature and OH number density after nanosecond pulse burst discharges in lean H(2)-air, CH(4)-air and C(2)H(4)-air mixtures; and temperature after the nanosecond pulse discharge burst during plasma-assisted ignition of lean H2-mixtures, showing good agreement with the data. The model predictions for OH number density in lean C(3)H(8)-air mixtures differ from the experimental results, over-predicting its absolute value and failing to predict transient OH rise and decay after the discharge burst. The agreement with the data for C(3)H(8)-air is improved considerably if a different conventional hydrocarbon chemistry reaction set (LLNL methane-n-butane flame mechanism) is used. The results of mechanism validation demonstrate its applicability for analysis of plasma chemical oxidation and ignition of low-temperature H(2)-air, CH(4)-air and C(2)H(4)-air mixtures using nanosecond pulse discharges. Kinetic modelling of low-temperature plasma excited propane-air mixtures demonstrates the need for development of a more accurate

  15. Remote Systems Design & Deployment

    Energy Technology Data Exchange (ETDEWEB)

    Bailey, Sharon A.; Baker, Carl P.; Valdez, Patrick LJ

    2009-08-28

    The Pacific Northwest National Laboratory (PNNL) was tasked by Washington River Protection Solutions, LLC (WRPS) to provide information and lessons learned relating to the design, development and deployment of remote systems, particularly remote arm/manipulator systems. This report reflects PNNL’s experience with remote systems and lays out the most important activities that need to be completed to successfully design, build, deploy and operate remote systems in radioactive and chemically contaminated environments. It also contains lessons learned from PNNL’s work experiences, and the work of others in the national laboratory complex.

  16. A comparative study of nitrogen plasma effect on field emission characteristics of single wall carbon nanotubes synthesized by plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Kumar, Avshish; Parveen, Shama; Husain, Samina; Ali, Javid; Zulfequar, Mohammad; Harsh; Husain, Mushahid

    2014-12-01

    Vertically aligned single wall carbon nanotubes (SWCNTs) with large scale control of diameter, length and alignment have successfully been grown by plasma enhanced chemical vapor deposition (PECVD) system. The nickel (Ni) as catalyst deposited on silicon (Si) substrate was used to grow the SWCNTs. Field emission (FE) characteristics of the as grown SWCNTs were measured using indigenously designed setup in which a diode is configured in such a way that by applying negative voltage on the copper plate (cathode) with respect to stainless steel anode plate, current density can be recorded. To measure the FE characteristics, SWCNTs film pasted on the copper plate with silver epoxy was used as electron emitter source. The effective area of anode was ∼78.5 mm2 for field emission measurements. The emission measurements were carried out under high vacuum pressure of the order of 10-6 Torr to minimize the electron scattering and degradation of the emitters. The distance between anode and cathode was kept 500 μm (constant) during entire field emission studies. The grown SWCNTs are excellent field emitters, having emission current density higher than 25 mA/cm2 at turn-on field 1.3 V/μm. In order to enhance the field emission characteristics, the as grown SWCNTs have been treated under nitrogen (N2) plasma for 5 min and again field emission characteristics have been measured. The N2 plasma treated SWCNTs show a good enhancement in the field emission properties with emission current density 81.5 mA/cm2 at turn on field 1.2 V/μm. The as-grown and N2 plasma treated SWCNTs were also characterized by field emission scanning electron microscope (FESEM), high resolution transmission electron microscope (HRTEM), Raman spectrometer, Fourier transform infrared spectrometer (FTIR) and X-ray photoelectron spectroscopy (XPS).

  17. Effects of initial layers on surface roughness and crystallinity of microcrystalline silicon thin films formed by remote electron cyclotron resonance silane plasma

    CERN Document Server

    Murata, K; Hori, Masaki; Goto, T; Ito, M

    2002-01-01

    We have observed mu c-Si:H films grown in the glass substrate in electron cyclotron resonance plasma-enhanced chemical vapor deposition employing two-step growth (TSG) method, where the seed layer was formed without charged species firstly, and subsequently, the film with charged species. The mu c-Si:H films with smooth surface and high crystallinity were synthesized with a relatively high deposition rate at a low substrate temperature by TSG. By Fourier transform infrared attenuated-total reflection, it was found that the surface roughness and crystallinity of seed layer were related to the ratio of SiH bonds over SiH sub 2 ones in the film. Consequently, the control of chemical bonds at the initial layer is of importance and TSG method is effective for the formation of mu c-Si:H film with high quality.

  18. Direct fabrication of 3D graphene on nanoporous anodic alumina by plasma-enhanced chemical vapor deposition

    Science.gov (United States)

    Zhan, Hualin; Garrett, David J.; Apollo, Nicholas V.; Ganesan, Kumaravelu; Lau, Desmond; Prawer, Steven; Cervenka, Jiri

    2016-01-01

    High surface area electrode materials are of interest for a wide range of potential applications such as super-capacitors and electrochemical cells. This paper describes a fabrication method of three-dimensional (3D) graphene conformally coated on nanoporous insulating substrate with uniform nanopore size. 3D graphene films were formed by controlled graphitization of diamond-like amorphous carbon precursor films, deposited by plasma-enhanced chemical vapour deposition (PECVD). Plasma-assisted graphitization was found to produce better quality graphene than a simple thermal graphitization process. The resulting 3D graphene/amorphous carbon/alumina structure has a very high surface area, good electrical conductivity and exhibits excellent chemically stability, providing a good material platform for electrochemical applications. Consequently very large electrochemical capacitance values, as high as 2.1 mF for a sample of 10 mm3, were achieved. The electrochemical capacitance of the material exhibits a dependence on bias voltage, a phenomenon observed by other groups when studying graphene quantum capacitance. The plasma-assisted graphitization, which dominates the graphitization process, is analyzed and discussed in detail.

  19. Preliminary study on atmospheric-pressure plasma-based chemical dry figuring and finishing of reaction-sintered silicon carbide

    Science.gov (United States)

    Shen, Xinmin; Deng, Hui; Zhang, Xiaonan; Peng, Kang; Yamamura, Kazuya

    2016-10-01

    Reaction-sintered silicon carbide (RS-SiC) is a research focus in the field of optical manufacturing. Atmospheric-pressure plasma-based chemical dry figuring and finishing, which consist of plasma chemical vaporization machining (PCVM) and plasma-assisted polishing (PAP), were applied to improve material removal rate (MRR) in rapid figuring and ameliorate surface quality in fine finishing. Through observing the processed RS-SiC sample in PCVM by scanning white-light interferometer (SWLI), the calculated peak-MRR and volume-MRR were 0.533 μm/min and 2.78×10-3 mm3/min, respectively. The comparisons of surface roughness and morphology of the RS-SiC samples before and after PCVM were obtained by the scanning electron microscope and atomic force microscope. It could be found that the processed RS-SiC surface was deteriorated with surface roughness rms 382.116 nm. The evaluations of surface quality of the processed RS-SiC sample in PAP corresponding to different collocations of autorotation speed and revolution speed were obtained by SWLI measurement. The optimal surface roughness rms of the processed RS-SiC sample in PAP was 2.186 nm. There were no subsurface damages, scratches, or residual stresses on the processed sample in PAP. The results indicate that parameters in PAP should be strictly selected, and the optimal parameters can simultaneously obtain high MRR and smooth surface.

  20. Benzylammonium Thermometer Ions: Internal Energies of Ions Formed by Low Temperature Plasma and Atmospheric Pressure Chemical Ionization.

    Science.gov (United States)

    Stephens, Edward R; Dumlao, Morphy; Xiao, Dan; Zhang, Daming; Donald, William A

    2015-12-01

    The extent of internal energy deposition upon ion formation by low temperature plasma and atmospheric pressure chemical ionization was investigated using novel benzylammonium thermometer ions. C-N heterolytic bond dissociation enthalpies of nine 4-substituted benzylammoniums were calculated using CAM-B3LYP/6-311++G(d,p), which was significantly more accurate than B3LYP/6-311++G(d,p), MP2/6-311++G(d,p), and CBS-QB3 for calculating the enthalpies of 20 heterolytic dissociation reactions that were used to benchmark theory. All 4-substituted benzylammonium thermometer ions fragmented by a single pathway with comparable dissociation entropies, except 4-nitrobenzylammonium. Overall, the extent of energy deposition into ions formed by low temperature plasma was significantly lower than those formed by atmospheric pressure chemical ionization under these conditions. Because benzylamines are volatile, this new suite of thermometer ions should be useful for investigating the extent of internal energy deposition during ion formation for a wide range of ionization methods, including plasma, spray and laser desorption-based techniques. Graphical Abstract ᅟ.

  1. Comparison of some effects of modification of a polylactide surface layer by chemical, plasma, and laser methods

    Science.gov (United States)

    Moraczewski, Krzysztof; Rytlewski, Piotr; Malinowski, Rafał; Żenkiewicz, Marian

    2015-08-01

    The article presents the results of studies and comparison of selected properties of the modified PLA surface layer. The modification was carried out with three methods. In the chemical method, a 0.25 M solution of sodium hydroxide in water and ethanol was utilized. In the plasma method, a 50 W generator was used, which produced plasma in the air atmosphere under reduced pressure. In the laser method, a pulsed ArF excimer laser with fluency of 60 mJ/cm2 was applied. Polylactide samples were examined by using the following techniques: scanning electron microscopy (SEM), atomic force microscopy (AFM), goniometry and X-ray photoelectron spectroscopy (XPS). Images of surfaces of the modified samples were recorded, contact angles were measured, and surface free energy was calculated. Qualitative and quantitative analyses of chemical composition of the PLA surface layer were performed as well. Based on the survey it was found that the best modification results are obtained using the plasma method.

  2. CH spectroscopy for carbon chemical erosion analysis in high density low temperature hydrogen plasma

    NARCIS (Netherlands)

    Westerhout, J.; Cardozo, N. J. L.; Rapp, J.; van Rooij, G. J.

    2009-01-01

    The CH A-X molecular band is measured upon seeding the hydrogen plasma in the linear plasma generator Pilot-PSI [electron temperature T-e=0.1-2.5 eV and electron density n(e)=(0.5-5) X 10(20) m(-3)] with methane. Calculated inverse photon efficiencies for these conditions range from 3 up to >10(6

  3. Effects of molecular size and chemical factor on plasma gene transfection

    Science.gov (United States)

    Ikeda, Yoshihisa; Motomura, Hideki; Kido, Yugo; Satoh, Susumu; Jinno, Masafumi

    2016-07-01

    In order to clarify the mechanism of plasma gene transfection, the relationship between transfection efficiency and transferred molecular size was investigated. Molecules with low molecular mass (less than 50 kDa; dye or dye-labeled oligonucleotide) and high molecular mass (more than 1 MDa; plasmid DNA or fragment of plasmid DNA) were transferred to L-929 cells. It was found that the transfection efficiency decreases with increasing in transferred molecular size and also depends on the tertiary structure of transferred molecules. Moreover, it was suggested the transfection mechanism is different between the molecules with low (less than 50 kDa) and high molecular mass (higher than 1 MDa). For the amount of gene transfection after plasma irradiation, which is comparable to that during plasma irradiation, it is shown that H2O2 molecules are the main contributor. The transfection efficiency decreased to 0.40 ± 0.22 upon scavenging the H2O2 generated by plasma irradiation using the catalase. On the other hand, when the H2O2 solution is dropped into the cell suspension without plasma irradiation, the transfection efficiency is almost 0%. In these results, it is also suggested that there is a synergetic effect of H2O2 with electrical factors or other reactive species generated by plasma irradiation.

  4. The evolving role of lyophilized plasma in remote damage control resuscitation in the French Armed Forces Health Service.

    Science.gov (United States)

    Sailliol, Anne; Martinaud, Christophe; Cap, Andrew P; Civadier, Corinne; Clavier, Benoit; Deshayes, Anne-Virginie; Mendes, Anne-Christine; Pouget, Thomas; Demazeau, Nicolas; Chueca, Marine; Martelet, François-Régis; Ausset, Sylvain

    2013-01-01

    Freeze-dried plasma was developed by the US Army for the resuscitation of combat casualties during World War II. The French Military Blood Institute began producing French lyophilized plasma (FLYP) in 1949, in accordance with French blood product guidelines. Since 2010, a photochemical pathogen inactivation process has been implemented to reduce the remaining transfusion-related infectious risk. All quality controls for this procedure verify that the hemostatic properties of FLYP are conserved. FLYP is compatible with all blood types, can be stored at room temperature for 2 years, and its reconstitution requires less than 6 minutes. As a result, FLYP allows quick delivery of all the coagulation proteins and the application of a 1:1 ratio of FLYP and red blood cells in the context of a massive transfusion. Hemovigilance data collected in France since 1994 have included FLYP. Results indicate no reporting of infection related to the use of FLYP. Clinical monitoring with a focus on hemostasis was implemented in 2002 and expanded in 2010. The data, obtained from overseas operations, confirmed the indications, the safety and the clinical efficacy of FLYP. Further research is needed to determine specific indications for FLYP in the therapeutic management of civilian patients with severe hemorrhage.

  5. Influence of ignition condition on the growth of silicon thin films using plasma enhanced chemical vapour deposition

    Institute of Scientific and Technical Information of China (English)

    Zhang Hai-Long; Liu Feng-Zhen; Zhu Mei-Fang; Liu Jin-Long

    2012-01-01

    The influences of the plasma ignition condition in plasma enhanced chemical vapour deposition (PECVD) on the interfaces and the microstructures of hydrogenated microcrystalline Si (μc-Si:H) thin films are investigated.The plasma ignition condition is modified by varying the ratio of SiH4 to H2 (RH).For plasma ignited with a constant gas ratio,the time-resolved optical emission spectroscopy presents a low value of the emission intensity ratio of Hα to SiH(IHα/IsiH) at the initial stage,which leads to a thick amorphous incubation layer.For the ignition condition with a profiling RH,the higher IHα/IsiH values are realized.By optimizing the RH modulation,a uniform crystallinity along the growth direction and a denser μc-Si:H film can be obtained.However,an excessively high IHα/IsiH* may damage the interface properties,which is indicated by capacitance-voltage (C-V) measurements.Well controlling the ignition condition is critically important for the applications of Si thin films.

  6. Characterization of low temperature graphene synthesis in inductively coupled plasma chemical vapor deposition process with optical emission spectroscopy.

    Science.gov (United States)

    Ma, Yifei; Kim, Daekyoung; Jang, Haegyu; Cho, Sung Min; Chae, Heeyeop

    2014-12-01

    Low-temperature graphene was synthesized at 400 degrees C with inductively coupled plasma chemical vapor deposition (PECVD) process. The effects of plasma power and flow rate of various carbon containing precursors and hydrogen on graphene properties were investigated with optical emission spectroscopy (OES). Various radicals monitored by OES were correlated with graphene film properties such as sheet resistance, I(D)/I(G) ratio of Raman spectra and transparency. C2H2 was used as a main precursor and the increase of plasma power enhanced intensity of carbon (C2) radical OES intensity in plasma, reduced sheet resistance and increased transparency of graphene films. The reduced flow rate of C2H2 decreased sheet resistance and increased transparency of graphene films in the range of this study. H2 addition was found to increase sheet resistance, transparency and attributed to reduction of graphene grain and etching graphene layers. OES analysis showed that C2 radicals contribute to graphite networking and sheet resistance reduction. TEM and AFM were applied to provide credible information that graphene had been successfully grown at low temperature.

  7. Highly Uniform Wafer-scale Synthesis of α-MoOsub>3sub> by Plasma Enhanced Chemical Vapor Deposition.

    Science.gov (United States)

    Kim, HyeongU; Son, Juhyun; Kulkarni, Atul; Ahn, Chisung; Kim, Ki Seok; Shin, Dongjoo; Yeom, Geun; Kim, Taesung

    2017-03-20

    Molybdenum oxide (MoOsub>3sub>) has gained immense attention because of its high electron mobility, wide band gap, and excellent optical and catalytic properties. However, the synthesis of uniform and large-area MoOsub>3sub> is challenging. Here, we report the synthesis of wafer-scale α-MoO3 by plasma oxidation of Mo-deposited on Si/SiOsub>2sub>. Mo was oxidized by Osub>2sub> plasma in a plasma enhanced chemical vapor deposition (PECVD) system at 150 °C. Mo was oxidized by Osub>2sub> plasma in a PECVD system at 150 °C. It was found that the synthesized α-MoOsub>3sub> had a highly uniform crystalline structure. For the as-synthesized α-MoOsub>3sub> sensor, we observed a current change when the relative humidity was increased from 11% to 95%. The sensor was exposed to different humidity levels with fast recovery time of about 8 s. Hence this feasibility study shows that MoOsub>3sub> synthesized at low temperature can be utilized for the gas sensing applications by adopting flexible device technology.

  8. The component content of active particles in a plasma-chemical reactor based on volume barrier discharge

    Science.gov (United States)

    Soloshenko, I. A.; Tsiolko, V. V.; Pogulay, S. S.; Terent'yeva, A. G.; Bazhenov, V. Yu; Shchedrin, A. I.; Ryabtsev, A. V.; Kuzmichev, A. I.

    2007-02-01

    In this paper the results of theoretical and experimental studies of the component content of active particles formed in a plasma-chemical reactor composed of a multiple-cell generator of active particles, based on volume barrier discharge, and a working chamber are presented. For calculation of the content of uncharged plasma components an approach is proposed which is based on averaging of the power introduced over the entire volume. Advantages of such an approach lie in an absence of fitting parameters, such as the dimensions of microdischarges, their surface density and rate of breakdown. The calculation and the experiment were accomplished with the use of dry air (20% relative humidity) as the plasma generating medium. Concentrations of O3, HNO3, HNO2, N2 O5 and NO3 were measured experimentally in the discharge volume and working chamber for the residence time of particles on a discharge of 0.3 s and more and discharge specific power of 1.5 W cm-3. It has been determined that the best agreement between the calculation and the experiment occurs at calculated gas medium temperatures in the discharge plasma of about 400-425 K, which correspond to the experimentally measured rotational temperature of nitrogen. In most cases the calculated concentrations of O3, HNO3, HNO2, N2O5 and NO3 for the barrier discharge and the working chamber are in fairly good agreement with the respective measured values.

  9. Gene expression responses of HeLa cells to chemical species generated by an atmospheric plasma flow

    Energy Technology Data Exchange (ETDEWEB)

    Yokoyama, Mayo, E-mail: yokoyama@plasma.ifs.tohoku.ac.jp [Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan); Johkura, Kohei, E-mail: kohei@shinshu-u.ac.jp [Department of Histology and Embryology, Shinshu University School of Medicine, 3-1-1 Asahi, Matsumoto 390-8621 (Japan); Sato, Takehiko, E-mail: sato@ifs.tohoku.ac.jp [Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan)

    2014-08-08

    Highlights: • Response of HeLa cells to a plasma-irradiated medium was revealed by DNA microarray. • Gene expression pattern was basically different from that in a H{sub 2}O{sub 2}-added medium. • Prominently up-/down-regulated genes were partly shared by the two media. • Gene ontology analysis showed both similar and different responses in the two media. • Candidate genes involved in response to ROS were detected in each medium. - Abstract: Plasma irradiation generates many factors able to affect the cellular condition, and this feature has been studied for its application in the field of medicine. We previously reported that hydrogen peroxide (H{sub 2}O{sub 2}) was the major cause of HeLa cell death among the chemical species generated by high level irradiation of a culture medium by atmospheric plasma. To assess the effect of plasma-induced factors on the response of live cells, HeLa cells were exposed to a medium irradiated by a non-lethal plasma flow level, and their gene expression was broadly analyzed by DNA microarray in comparison with that in a corresponding concentration of 51 μM H{sub 2}O{sub 2}. As a result, though the cell viability was sufficiently maintained at more than 90% in both cases, the plasma-medium had a greater impact on it than the H{sub 2}O{sub 2}-medium. Hierarchical clustering analysis revealed fundamentally different cellular responses between these two media. A larger population of genes was upregulated in the plasma-medium, whereas genes were downregulated in the H{sub 2}O{sub 2}-medium. However, a part of the genes that showed prominent differential expression was shared by them, including an immediate early gene ID2. In gene ontology analysis of upregulated genes, the plasma-medium showed more diverse ontologies than the H{sub 2}O{sub 2}-medium, whereas ontologies such as “response to stimulus” were common, and several genes corresponded to “response to reactive oxygen species.” Genes of AP-1 proteins, e.g., JUN

  10. Remote Marine Aerosol: A Characterization of Physical, Chemical and Optical Properties and their Relation to Radiative Transfer in the Troposphere

    Science.gov (United States)

    Clarke, Antony D.; Porter, John N.

    1997-01-01

    Our research effort is focused on improving our understanding of aerosol properties needed for optical models for remote marine regions. This includes in-situ and vertical column optical closure and involves a redundancy of approaches to measure and model optical properties that must be self consistent. The model is based upon measured in-situ aerosol properties and will be tested and constrained by the vertically measured spectral differential optical depth of the marine boundary layer, MBL. Both measured and modeled column optical properties for the boundary layer, when added to the free-troposphere and stratospheric optical depth, will be used to establish spectral optical depth over the entire atmospheric column for comparison to and validation of satellite derived radiances (AVHRR).

  11. Immobilization of enzyme and antibody on ALD-HfO2-EIS structure by NH3 plasma treatment

    Science.gov (United States)

    Wang, I.-Shun; Lin, Yi-Ting; Huang, Chi-Hsien; Lu, Tseng-Fu; Lue, Cheng-En; Yang, Polung; Pijanswska, Dorota G.; Yang, Chia-Ming; Wang, Jer-Chyi; Yu, Jau-Song; Chang, Yu-Sun; Chou, Chien; Lai, Chao-Sung

    2012-03-01

    Thin hafnium oxide layers deposited by an atomic layer deposition system were investigated as the sensing membrane of the electrolyte-insulator-semiconductor structure. Moreover, a post-remote NH3 plasma treatment was proposed to replace the complicated silanization procedure for enzyme immobilization. Compared to conventional methods using chemical procedures, remote NH3 plasma treatment reduces the processing steps and time. The results exhibited that urea and antigen can be successfully detected, which indicated that the immobilization process is correct.

  12. High rate deposition of microcrystalline silicon films by high-pressure radio frequency plasma enhanced chemical vapor deposition (PECVD)

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    Hydrogenated microcrystalline silicon (μc-Si:H) thin films were prepared by high- pressure radio-frequency (13.56 MHz) plasma enhanced chemical vapor deposition (rf-PECVD) with a screened plasma. The deposition rate and crystallinity varying with the deposition pressure, rf power, hydrogen dilution ratio and electrodes distance were systematically studied. By optimizing the deposition parameters the device quality μc-Si:H films have been achieved with a high deposition rate of 7.8 /s at a high pressure. The Voc of 560 mV and the FF of 0.70 have been achieved for a single-junction μc-Si:H p-i-n solar cell at a deposition rate of 7.8 /s.

  13. Growth of carbon nanofibers in plasma-enhanced chemical vapor deposition

    Science.gov (United States)

    Denysenko, Igor; Ostrikov, Kostya; Tam, Eugene

    2008-10-01

    A theoretical model describing the plasma-assisted growth of carbon nanofibers with metal catalyst particles on top is proposed. Using the model, the plasma-related effects on the nanofiber growth parameters such us the surface diffusion growth rate, the effective carbon flux to the catalyst surface, the characteristic residence time and diffusion length of carbon on the catalyst surface, and the surface coverages, have been studied. It has been found how these parameters depend on the catalyst surface temperature and ion and etching gas fluxes to the catalyst surface. The optimum conditions under which a low-temperature plasma environment can benefit the carbon nanofiber growth are formulated. It has been also found how the plasma environment affects the temperature distribution over the length of the carbon nanofibers. Conditions when the temperature of the catalyst nanoparticles is higher than the temperature of the substrate holder are determined. The results here are in a good agreement with the available experimental data on the carbon nanofiber growth and can be used for optimizing synthesis of nanoassemblies in low-temperature plasma-assisted nanofabrication.

  14. Electrochromic Devices Deposited on Low-Temperature Plastics by Plasma-Enhanced Chemical Vapor Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Robbins, Joshua; Seman, Michael

    2005-09-20

    Electrochromic windows have been identified by the Basic energy Sciences Advisory committee as an important technology for the reduction of energy spent on heating and cooling in residential and commercial buildings. Electrochromic devices have the ability to reversibly alter their optical properties in response to a small electric field. By blocking ultraviolet and infrared radiation, while modulating the incoming visible radiation, electrochromics could reduce energy consumption by several Quads per year. This amounts to several percent of the total annual national energy expenditures. The purpose of this project was to demonstrate proof of concept for using plasma-enhanced chemical vapor deposition (PECVD) for depositing all five layers necessary for full electrochromic devices, as an alternative to sputtering techniques. The overall goal is to produce electrochromic devices on flexible polymer substrates using PECVD to significantly reduce the cost of the final product. We have successfully deposited all of the films necessary for a complete electrochromic devices using PECVD. The electrochromic layer, WO3, displayed excellent change in visible transmission with good switching times. The storage layer, V2O5, exhibited a high storage capacity and good clear state transmission. The electrolyte, Ta2O5, was shown to functional with good electrical resistivity to go along with the ability to transfer Li ions. There were issues with leakage over larger areas, which can be address with further process development. We developed a process to deposit ZnO:Ga with a sheet resistance of < 50 W/sq. with > 90% transmission. Although we were not able to deposit on polymers due to the temperatures required in combination with the inverted position of our substrates. Two types of full devices were produced. Devices with Ta2O5 were shown to be functional using small aluminum dots as the top contact. The polymer electrolyte devices were shown to have a clear state transmission of

  15. Glacial and Periglacial Chemical Weathering on Mars: New Results and New Questions from Field Analog Studies and Mars Remote Sensing

    Science.gov (United States)

    Horgan, B.; Scudder, N.; Rutledge, A.; Ackiss, S.

    2016-09-01

    Ice has been a powerful physical weather agent on Mars through geologic time, however, it is less well understood how much chemical weathering ice has caused on Mars, and how the mode of alteration has changed with the climate over time.

  16. HIGH-THROUGHPUT CHEMICAL SCREENING USING PROTEIN PROFILING OF FISH PLASMA

    Science.gov (United States)

    Compounds that affect the hormone system, referred to as "endocrine-disrupting chemicals" (EDCs), cause human and animal health problems. It is necessary to test putative EDC chemicals for such deleterious effects, though current testing methodologies are time/animal intensive an...

  17. Optical and passivating properties of hydrogenated amorphous silicon nitride deposited by plasma enhanced chemical vapour deposition for application on silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Wight, Daniel Nilsen

    2008-07-01

    quality, etch rate. The response of these parameters to high temperature anneals were correlated with structural changes in the silicon nitride films as measured by using the hydrogen bond concentration. Plasma enhanced chemical vapour deposition allows continuous variation in nearly all deposition parameters. The parameters studied in this work are the gas flow ratios and excitation power. In both direct and remote deposition systems, the increase in deposition power density lead to higher activation of ammonia which in turn lead to augmented incorporation of nitrogen into the films and thus lower refractive index. For a direct system, the same parameter change lead to a drastic fall in passivation quality of Czochralski silicon attributed to an increase in ion bombardment as well as the general observation that as deposited passivation tends to increase with refractive index. Silicon nitride films with variations in refractive index were also made by varying the silane-to-ammonia gas flow ratio. This simple parameter adjustment makes plasma enhanced chemical vapour deposited silicon nitride applicable to double layer anti-reflective coatings simulated in this work. The films were found to have an etch rate in 5% hydrofluoric acid that decreased with increasing refractive index. This behaviour is attributed to the decreasing concentration of nitrogen-to-hydrogen bonds in the films. Such bonds at the surface of silicon nitride have been suggested to be involved in the main reaction mechanism when etching silicon nitride in hydrofluoric acid. Annealing the films lead to a drastic fall in etch rates and was linked to the release of hydrogen from the nitrogen-hydrogen bonds. (author). 115 refs., 35 figs., 6 tabs

  18. Resolving the nanostructure of plasma-enhanced chemical vapor deposited nanocrystalline SiOx layers for application in solar cells

    Science.gov (United States)

    Klingsporn, M.; Kirner, S.; Villringer, C.; Abou-Ras, D.; Costina, I.; Lehmann, M.; Stannowski, B.

    2016-06-01

    Nanocrystalline silicon suboxides (nc-SiOx) have attracted attention during the past years for the use in thin-film silicon solar cells. We investigated the relationships between the nanostructure as well as the chemical, electrical, and optical properties of phosphorous, doped, nc-SiO0.8:H fabricated by plasma-enhanced chemical vapor deposition. The nanostructure was varied through the sample series by changing the deposition pressure from 533 to 1067 Pa. The samples were then characterized by X-ray photoelectron spectroscopy, spectroscopic ellipsometry, Raman spectroscopy, aberration-corrected high-resolution transmission electron microscopy, selected-area electron diffraction, and a specialized plasmon imaging method. We found that the material changed with increasing pressure from predominantly amorphous silicon monoxide to silicon dioxide containing nanocrystalline silicon. The nanostructure changed from amorphous silicon filaments to nanocrystalline silicon filaments, which were found to cause anisotropic electron transport.

  19. Thermodynamics of the quark-gluon plasma at finite chemical potential: color path integral Monte Carlo results

    Energy Technology Data Exchange (ETDEWEB)

    Filinov, V.S.; Fortov, V.E. [Joint Institute for High Temperatures, Russian Academy of Sciences, Izhorskaya 13, bd. 2, 125412 Moscow (Russian Federation); Bonitz, M. [Institute for Theoretical Physics and Astrophysics, Christian Albrechts University Kiel, Leibnizstrasse 15, D-24098 Kiel (Germany); Ivanov, Y.B. [National Research Center ' ' Kurchatov Institute' ' , Kurchatov Sq. 1, 123182 Moscow, Russia, National Research Nuclear University ' ' MEPhI' ' , Kashirskoe sh. 31, 115409 Moscow (Russian Federation); Ilgenfritz, E.M. [Joint Institute for Nuclear Reseach, Joliot-Curie str. 6, Dubna, 141980, Moscow Region (Russian Federation)

    2015-02-01

    Based on the constituent quasiparticle model of the quark-gluon plasma (QGP), color quantum path-integral Monte-Carlo (PIMC) calculations of the thermodynamic properties of the QGP are performed. We extend our previous zero chemical potential simulations to the QGP at finite baryon chemical potential. The results indicate that color PIMC can be applied not only above the QCD critical temperature T{sub c} but also below T{sub c}. Besides reproducing the lattice equation of state our approach yields also valuable additional insight into the internal structure of the QGP, via the pair distribution functions of the various quasiparticles. In particular, the pair distribution function of gluons reflects the existence of gluon-gluon bound states at low temperatures and μ = 175 MeV, i.e. glueballs, while meson-like bound states are not found. (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  20. Coal-fired open cycle MHD combustion plasmas - Chemical equilibrium and transport properties workshop results

    Science.gov (United States)

    Sullivan, L. D.; Klepeis, J. E.; Coderre, W. J.; Fischer, W. H.

    1980-01-01

    For electrical power generation utilizing a high temperature alkali-seeded coal combustion plasma, the certainty of high electrical conductivity in the presence of coal ash and trace impurities is vitally important, especially for use in extrapolation of existing designs to higher power levels, as envisioned for commercial applications. The paper surveys the results of the workshop which provides an industry wide overview of the computational methods and analyses that are currently in use. Attention is given to uncertainty bands for plasma electrical conductivity. Also discussed are other issues such as coal, slag, seed, and conductivity. Finally, the paper gives suggested areas for further work.

  1. Responses of Solid Tumor Cells in DMEM to Reactive Oxygen Species Generated by Non-Thermal Plasma and Chemically Induced ROS Systems

    Science.gov (United States)

    Kaushik, Neha; Uddin, Nizam; Sim, Geon Bo; Hong, Young June; Baik, Ku Youn; Kim, Chung Hyeok; Lee, Su Jae; Kaushik, Nagendra Kumar; Choi, Eun Ha

    2015-02-01

    In this study, we assessed the role of different reactive oxygen species (ROS) generated by soft jet plasma and chemical-induced ROS systems with regard to cell death in T98G, A549, HEK293 and MRC5 cell lines. For a comparison with plasma, we generated superoxide anion (O2-), hydroxyl radical (HO.), and hydrogen peroxide (H2O2) with chemicals inside an in vitro cell culture. Our data revealed that plasma decreased the viability and intracellular ATP values of cells and increased the apoptotic population via a caspase activation mechanism. Plasma altered the mitochondrial membrane potential and eventually up-regulated the mRNA expression levels of BAX, BAK1 and H2AX gene but simultaneously down-regulated the levels of Bcl-2 in solid tumor cells. Moreover, a western blot analysis confirmed that plasma also altered phosphorylated ERK1/2/MAPK protein levels. At the same time, using ROS scavengers with plasma, we observed that scavengers of HO. (mannitol) and H2O2 (catalase and sodium pyruvate) attenuated the activity of plasma on cells to a large extent. In contrast, radicals generated by specific chemical systems enhanced cell death drastically in cancer as well as normal cell lines in a dose-dependent fashion but not specific with regard to the cell type as compared to plasma.

  2. Improved integration of ultra-thin high-k dielectrics in few-layer MoS2 FET by remote forming gas plasma pretreatment

    Science.gov (United States)

    Wang, Xiao; Zhang, Tian-Bao; Yang, Wen; Zhu, Hao; Chen, Lin; Sun, Qing-Qing; Zhang, David Wei

    2017-01-01

    The effective and high-quality integration of high-k dielectrics on two-dimensional (2D) crystals is essential to the device structure engineering and performance improvement of field-effect transistor (FET) based on the 2D semiconductors. We report a 2D MoS2 transistor with ultra-thin Al2O3 top-gate dielectric (6.1 nm) and extremely low leakage current. Remote forming gas plasma pretreatment was carried out prior to the atomic layer deposition, providing nucleation sites with the physically adsorbed ions on the MoS2 surface. The top gate MoS2 FET exhibited excellent electrical performance, including high on/off current ratio over 109, subthreshold swing of 85 mV/decade and field-effect mobility of 45.03 cm2/V s. Top gate leakage current less than 0.08 pA/μm2 at 4 MV/cm has been obtained, which is the smallest compared with the reported top-gated MoS2 transistors. Such an optimized integration of high-k dielectric in 2D semiconductor FET with enhanced performance is very attractive, and it paves the way towards the realization of more advanced 2D nanoelectronic devices and integrated circuits.

  3. Spectral properties of mixtures of montmorillonite and dark grains - Implications for remote sensing minerals containing chemically and physically adsorbed water

    Science.gov (United States)

    Clark, R. N.

    1983-01-01

    The spectral properties from 0.4 to 3 microns of montmorillonite plus dark carbon grains (called opaques) of various sizes are studied as a function of the weight fraction of opaques present. The reflectance level and band depths of the 1.4-, 1.9-, 2.2-, and 2.8-micron water and/or OH absorption features are analyzed using derived empirical relationships and scattering theory. It is found that the absorption band depths and reflectance level are a very nonlinear function of the weight fraction of opaques present but can be predicted in many cases by simple scattering theory. The 2.8-micron bound water fundamental band is the most difficult absorption feature to suppress. The overtone absorptions are suppressed a greater amount than the fundamental but are still apparent even when 10-20 wt pct opaques are present. The relationships observed and the simple scattering theory presented show that quantitative compositional remote sensing studies are feasible for surfaces containing complex mineral mixtures.

  4. In situ mineralogical-chemical analysis of Martian materials at landing/roving sites by active and passive remote sensing methods

    Science.gov (United States)

    Neukum, G.; Lehmann, F.; Regner, P.; Jaumann, R.

    1988-01-01

    Remote sensing of the Martian surface from the ground and from orbiting spacecraft has provided some first-order insight into the mineralogical-chemical composition and the weathering state of Martian surface materials. Much more detailed information can be gathered from performing such measurements in situ at the landing sites or from a rover in combination with analogous measurements from orbit. Measurements in the wavelength range of approximately 0.3 to 12.0 micrometers appear to be suitable to characterize much of the physical, mineralogical, petrological, and chemical properties of Martian surface materials and the weathering and other alteration processes that have acted on them. It is of particular importance to carry out measurements at the same time over a broad wavelength range since the reflectance signatures are caused by different effects and hence give different and complementing information. It appears particularly useful to employ a combination of active and passive methods because the use of active laser spectroscopy allows the obtaining of specific information on thermal infrared reflectance of surface materials. It seems to be evident that a spectrometric survey of Martian materials has to be focused on the analysis of altered and fresh mafic materials and rocks, water-bearing silicates, and possibly carbonates.

  5. Chemical compositions and plasma parameters of planetary nebulae with Wolf-Rayet and wels type central stars

    CERN Document Server

    Girard, P; Acker, A

    2006-01-01

    Aims: Chemical compositions and other properties of planetary nebulae around central stars of spectral types [WC], [WO], and wels are compared with those of `normal' central stars, in order to clarify the evolutionary status of each type and their interrelation. Methods: We use plasma diagnostics to derive from optical spectra the plasma parameters and chemical compositions of 48 planetary nebulae. We also reanalyze the published spectra of a sample of 167 non-WR PN. The results as well as the observational data are compared in detail with those from other studies of the objects in common. Results: The central star's spectral type is clearly correlated with electron density, temperature and excitation class of the nebula, [WC] nebulae tend to be smaller than the other types. All this corroborates the view of an evolutionary sequence from cool [WC 11] central stars inside dense, low excitation nebulae towards hot [WO 1] stars with low density, high excitation nebulae. The wels PN, however, appear to be a separ...

  6. Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor

    Energy Technology Data Exchange (ETDEWEB)

    Sulyaeva, Veronica S., E-mail: veronica@niic.nsc.ru [Department of Functional Materials Chemistry, Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk 630090 (Russian Federation); Kosinova, Marina L.; Rumyantsev, Yurii M.; Kuznetsov, Fedor A. [Department of Functional Materials Chemistry, Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk 630090 (Russian Federation); Kesler, Valerii G. [Laboratory of Physical Principles for Integrated Microelectronics, Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk 630090 (Russian Federation); Kirienko, Viktor V. [Laboratory of Nonequilibrium Semiconductors Systems, Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk 630090 (Russian Federation)

    2014-05-02

    Thin BC{sub x}N{sub y} films have been obtained by plasma enhanced chemical vapor deposition using N-trimethylborazine as a precursor. The films were deposited on Si(100) and fused silica substrates. The grown films were characterized by ellipsometry, Fourier transform infrared spectroscopy, scanning electron microscopy, X-ray energy dispersive spectroscopy, X-ray photoelectron spectroscopy, spectrophotometry, capacitance–voltage and current–voltage measurements. The deposition parameters, such as substrate temperature (373–973 K) and gas phase composition were varied. Low temperature BC{sub x}N{sub y} films were found to be high optical transparent layers in the range of 300–2000 nm, the transmittance as high as 93% has been achieved. BC{sub x}N{sub y} layers are dielectrics with dielectric constant k = 2.2–8.9 depending on the synthesis conditions. - Highlights: • Thin BC{sub x}N{sub y} films have been obtained by plasma enhanced chemical vapor deposition. • N-trimethylborazine was used as a precursor. • Low temperature BC{sub x}N{sub y} films were found to be high optical transparent layers (93%). • BC{sub x}N{sub y} layers are dielectrics with dielectric constant k = 2.2–8.9.

  7. Study of selective chemical downstream plasma etching of silicon nitride and silicon oxide for advanced patterning applications

    Science.gov (United States)

    Prévost, Emilie; Cunge, Gilles; De-Buttet, Côme; Lagrasta, Sebastien; Vallier, Laurent; Petit-Etienne, Camille

    2017-03-01

    The evolution of integrated components in the semiconductors industry is nowadays looking for ultra-high selective etching processes in order to etch high aspect ratio structures in complicated stacks of ultrathin layers. For ultra-high selective processes, typical plasma etching show limitations, while wet etching processes reach limitations due to capillary forces. For these reasons there is a great regain of interest today in chemical downstream etching systems (CDE), which combine the advantages of plasma and wet treatments. The absence of photons and ions allow to minimize damages and to achieve very high selectivity (in isotropic etching). In this work we investigated the parameters enabling to etch selectively the Si3N4 to the SiO2 by CDE. We shown that the correlation between the gas mixture and the wafer temperature is the key to obtain the desired selectivity. In order to optimize the processing window, the mixture composition (NF3/N2/O2/He) and the temperatures were screened by several DOE (Designs Of Experiments). Conditions are found in which the etching selectivity between the two silicon alloys is higher than 100, which allowed us to clean out sacrificial Si3N4 layers in very high aspect ratio (about 100) silicon trenches of nanometric size (60nm) without damaging the 10nm thin SiO2 caping layer (between the Si and the Si3N4). This demonstrates that downstream plasma etching can perform better than wet treatments in this case.

  8. Plasma-chemical treatment of hydrogen sulfide in natural gas processing. Final report, May 1991--December 1992

    Energy Technology Data Exchange (ETDEWEB)

    Harkness, J.B.L.; Doctor, R.D. [Argonne National Lab., IL (United States)

    1993-05-01

    A new process for the treatment of hydrogen sulfide waste that uses microwave plasma-chemical technology has been under development in Russia and the United States. Whereas the present waste-treatment technology, at best, only recovers sulfur, this novel process recovers both hydrogen and sulfur by dissociating hydrogen sulfide in a plasma by means of a microwave or radio-frequency reactor. A research project has been undertaken to determine the suitability of the plasma process in natural gas processing applications. The experiments tested acid-gas compositions with 30--65% carbon dioxide, 0--7% water, and 0--0.2% of a standard mixture of pipeline gas. The balance gas in all cases was hydrogen sulfide. The reactor pressure for the experiments was 50 torr, and the microwave power was 1.0 kW. Conversions of hydrogen sulfide ranged from 80 to 100%, while 35--50% of the carbon dioxide was converted to carbon monoxide. This conversion of carbon dioxide resulted in a loss of hydrogen production and an energy loss from a hydrogen sulfide waste-treatment perspective. Tests of a direct natural gas treatment concept showed that hydrocarbon losses were unacceptably high; consequently, the concept would not be economically viable.

  9. A consideration of potential confounding factors limiting chemical and biological recovery at Lochnagar, a remote mountain loch in Scotland

    Directory of Open Access Journals (Sweden)

    Derek MUIR

    2004-02-01

    Full Text Available Lochnagar, a remote loch in the Grampian Mountains of Scotland is one of the most studied freshwater bodies in the UK. It represents a key site in a number of monitoring programmes and has become the UK’s 'flag-ship' mountain lake in various EU funded projects over the last 15 years. Palaeolimnological studies have revealed the extent and diverse provenance of atmospherically deposited pollution at the site and show that the loch began to acidify in the mid-19th century. However, despite abatement strategies dramatically reducing the emission and deposition of non-marine sulphate and trace metals since the 1970s, the loch pH shows little sign of recovery and full basin fluxes of, for example, Pb and Hg show no decline or even a continued increase. It is suggested that the lack of recovery from acidification over the last 15 years of monitoring results from the balancing of the decline in sulphate by increased nitrate, and that this increase is related to winter duration and severity. The lack of response by the sediment record to declines in metal deposition is thought to be due to a continuing input of previously deposited metals from the catchment. Hypotheses for these enhanced catchment inputs involve responses to a changing climate. Site specific climate reconstructions and predictions for the 21st century suggest an accelerated increase in temperature rise and increased winter precipitation and storminess. These predicted changes are likely to exacerbate the input of metals (and other stored pollutants from the catchment but higher temperatures may also help to promote recovery from acidification.

  10. Aerosol Types using Passive Remote Sensing: Global Distribution, Consistency Check, Total-Column Investigation and Translation into Composition Derived from Climate and Chemical Transport Model

    Science.gov (United States)

    Kacenelenbogen, M. S.; Dawson, K. W.; Johnson, M. S.; Burton, S. P.; Redemann, J.; Hasekamp, O. P.; Hair, J. W.; Ferrare, R. A.; Butler, C. F.; Holben, B. N.; Beyersdorf, A. J.; Ziemba, L. D.; Froyd, K. D.; Dibb, J. E.; Shingler, T.; Sorooshian, A.; Jimenez, J. L.; Campuzano Jost, P.; Jacob, D. J.

    2015-12-01

    To improve the predictions of aerosol composition in chemical transport models (CTMs) and global climate models (GCMs), we have developed an aerosol classification algorithm (called Specified Clustering and Mahalanobis Classification, SCMC) that assigns an aerosol type to multi-parameter retrievals by spaceborne, airborne or ground based passive remote sensing instruments [Russell et al., 2014]. The aerosol types identified by our scheme are pure dust, polluted dust, urban-industrial/developed economy, urban-industrial/developing economy, dark biomass smoke, light biomass smoke and pure marine. We apply the SCMC method to two different total-column datasets of aerosol optical properties: inversions from the ground-based AErosol RObotic NETwork (AERONET) and retrievals from the space-borne POLDER (Polarization and Directionality of Earth's Reflectances) instrument. The POLDER retrievals that we use differ from the standard POLDER retrievals [Deuzé et al., 2001] as they make full use of multi-angle, multispectral polarimetric data [Hasekamp et al., 2011]. We analyze agreement in the aerosol types inferred from both AERONET and POLDER globally. Then, we investigate how our total-column "effective" SCMC aerosol types relate to different aerosol types within the column (i.e. either a mixture of different types within one layer in the vertical or the stacking of different aerosol types within the vertical column). For that, we compare AERONET-SCMC aerosol types to collocated NASA LaRC HSRL vertically resolved aerosol types [Burton et al., 2012] during the SEAC4RS and DISCOVER-AQ airborne field experiments, mostly over Texas in Aug-Sept 2013. Finally, in order to evaluate the GEOS-Chem CTM aerosol types, we translate each of our SCMC aerosol type into a unique distribution of GEOS-Chem aerosol composition (e.g. biomass burning, dust, sulfate, sea salt). We bridge the gap between remote sensing and model-inferred aerosol types by using multiple years of collocated AERONET

  11. Plasma-enhanced chemical vapor deposition of graphene on copper substrates

    Directory of Open Access Journals (Sweden)

    Nicolas Woehrl

    2014-04-01

    Full Text Available A plasma enhanced vapor deposition process is used to synthesize graphene from a hydrogen/methane gas mixture on copper samples. The graphene samples were transferred onto SiO2 substrates and characterized by Raman spectroscopic mapping and atomic force microscope topographical mapping. Analysis of the Raman bands shows that the deposited graphene is clearly SLG and that the sheets are deposited on large areas of several mm2. The defect density in the graphene sheets is calculated using Raman measurements and the influence of the process pressure on the defect density is measured. Furthermore the origin of these defects is discussed with respect to the process parameters and hence the plasma environment.

  12. Method of plasma enhanced chemical vapor deposition of diamond using methanol-based solutions

    Science.gov (United States)

    Tzeng, Yonhua (Inventor)

    2009-01-01

    Briefly described, methods of forming diamond are described. A representative method, among others, includes: providing a substrate in a reaction chamber in a non-magnetic-field microwave plasma system; introducing, in the absence of a gas stream, a liquid precursor substantially free of water and containing methanol and at least one carbon and oxygen containing compound having a carbon to oxygen ratio greater than one, into an inlet of the reaction chamber; vaporizing the liquid precursor; and subjecting the vaporized precursor, in the absence of a carrier gas and in the absence in a reactive gas, to a plasma under conditions effective to disassociate the vaporized precursor and promote diamond growth on the substrate in a pressure range from about 70 to 130 Torr.

  13. Mechanical and piezoresistive properties of thin silicon films deposited by plasma-enhanced chemical vapor deposition and hot-wire chemical vapor deposition at low substrate temperatures

    Science.gov (United States)

    Gaspar, J.; Gualdino, A.; Lemke, B.; Paul, O.; Chu, V.; Conde, J. P.

    2012-07-01

    This paper reports on the mechanical and piezoresistance characterization of hydrogenated amorphous and nanocrystalline silicon thin films deposited by hot-wire chemical vapor deposition (HWCVD) and radio-frequency plasma-enhanced chemical vapor deposition (PECVD) using substrate temperatures between 100 and 250 °C. The microtensile technique is used to determine film properties such as Young's modulus, fracture strength and Weibull parameters, and linear and quadratic piezoresistance coefficients obtained at large applied stresses. The 95%-confidence interval for the elastic constant of the films characterized, 85.9 ± 0.3 GPa, does not depend significantly on the deposition method or on film structure. In contrast, mean fracture strength values range between 256 ± 8 MPa and 600 ± 32 MPa: nanocrystalline layers are slightly stronger than their amorphous counterparts and a pronounced increase in strength is observed for films deposited using HWCVD when compared to those grown by PECVD. Extracted Weibull moduli are below 10. In terms of piezoresistance, n-doped radio-frequency nanocrystalline silicon films deposited at 250 °C present longitudinal piezoresistive coefficients as large as -(2.57 ± 0.03) × 10-10 Pa-1 with marginally nonlinear response. Such values approach those of crystalline silicon and of polysilicon layers deposited at much higher temperatures.

  14. Study of barrier properties and chemical resistance of recycled PET coated with amorphous carbon through a plasma enhanced chemical vapour deposition (PECVD) process.

    Science.gov (United States)

    Cruz, S A; Zanin, M; Nerin, C; De Moraes, M A B

    2006-01-01

    Many studies have been carried out in order to make bottle-to-bottle recycling feasible. The problem is that residual contaminants in recycled plastic intended for food packaging could be a risk to public health. One option is to use a layer of virgin material, named functional barrier, which prevents the contaminants migration process. This paper shows the feasibility of using polyethylene terephthalate (PET) recycled for food packaging employing a functional barrier made from hydrogen amorphous carbon film deposited by Plasma Enhanced Chemical Vapour Deposition (PECVD) process. PET samples were deliberately contaminated with a series of surrogates using a FDA protocol. After that, PET samples were coated with approximately 600 and 1200 Angstrons thickness of amorphous carbon film. Then, the migration tests using as food simulants: water, 10% ethanol, 3% acetic acid, and isooctane were applied to the sample in order to check the chemical resistance of the new coated material. After the tests, the liquid extracts were analysed using a solid-phase microextraction device (SPME) coupled to GC-MS.

  15. The end-point and course detection of plasma-chemical reactions on semiconductor structures

    Energy Technology Data Exchange (ETDEWEB)

    Janca, J. (Universita J.E. Purkyne, Brno, Czechoslovakia); Konecny, Z. (TESLA Roznov, n.p., Roznov pod Radhostem, Czechoslovakia)

    1980-01-01

    The end point and courses of the photoresist removal oxygen plasma by RF were determined by optical emission and mass spectrometry. The spectroscopic analysis shows large changes in CO and N2 molecular spectra the time dependencies of mass spectra are similar to optical spectroscopy results, but the interpretation is more complicated. This study demonstrates a process monitoring system which automatically detects and signals the completion of etching processes from etched wafers.

  16. Modular and efficient ozone systems based on massively parallel chemical processing in microchannel plasma arrays: performance and commercialization

    Science.gov (United States)

    Kim, M.-H.; Cho, J. H.; Park, S.-J.; Eden, J. G.

    2017-08-01

    Plasmachemical systems based on the production of a specific molecule (O3) in literally thousands of microchannel plasmas simultaneously have been demonstrated, developed and engineered over the past seven years, and commercialized. At the heart of this new plasma technology is the plasma chip, a flat aluminum strip fabricated by photolithographic and wet chemical processes and comprising 24-48 channels, micromachined into nanoporous aluminum oxide, with embedded electrodes. By integrating 4-6 chips into a module, the mass output of an ozone microplasma system is scaled linearly with the number of modules operating in parallel. A 115 g/hr (2.7 kg/day) ozone system, for example, is realized by the combined output of 18 modules comprising 72 chips and 1,800 microchannels. The implications of this plasma processing architecture for scaling ozone production capability, and reducing capital and service costs when introducing redundancy into the system, are profound. In contrast to conventional ozone generator technology, microplasma systems operate reliably (albeit with reduced output) in ambient air and humidity levels up to 90%, a characteristic attributable to the water adsorption/desorption properties and electrical breakdown strength of nanoporous alumina. Extensive testing has documented chip and system lifetimes (MTBF) beyond 5,000 hours, and efficiencies >130 g/kWh when oxygen is the feedstock gas. Furthermore, the weight and volume of microplasma systems are a factor of 3-10 lower than those for conventional ozone systems of comparable output. Massively-parallel plasmachemical processing offers functionality, performance, and commercial value beyond that afforded by conventional technology, and is currently in operation in more than 30 countries worldwide.

  17. Plasma-Sprayed Hydroxylapatite-Based Coatings: Chemical, Mechanical, Microstructural, and Biomedical Properties

    Science.gov (United States)

    Heimann, Robert B.

    2016-06-01

    This contribution discusses salient properties and functions of hydroxylapatite (HA)-based plasma-sprayed coatings, including the effect on biomedical efficacy of coating thickness, phase composition and distribution, amorphicity and crystallinity, porosity and surface roughness, cohesion and adhesion, micro- and nano-structured surface morphology, and residual coating stresses. In addition, it will provide details of the thermal alteration that HA particles undergo in the extremely hot plasma jet that leads to dehydroxylated phases such as oxyhydroxylapatite (OHA) and oxyapatite (OA) as well as thermal decomposition products such as tri-(TCP) and tetracalcium phosphates (TTCP), and quenched phases such as amorphous calcium phosphate (ACP). The contribution will further explain the role of ACP during the in vitro interaction of the as-deposited coatings with simulated body fluid resembling the composition of extracellular fluid (ECF) as well as the in vivo responses of coatings to the ECF and the host tissue, respectively. Finally, it will briefly describe performance profiles required to fulfill biological functions of osteoconductive bioceramic coatings designed to improve osseointegration of hip endoprostheses and dental root implants. In large parts, the content of this contribution is a targeted review of work done by the author and his students and coworkers over the last two decades. In addition, it is considered a stepping stone toward a standard operation procedure aimed at depositing plasma-sprayed bioceramic implant coatings with optimum properties.

  18. Generation of Diffuse Large Volume Plasma by an Ionization Wave from a Plasma Jet

    Science.gov (United States)

    Laroussi, Mounir; Razavi, Hamid

    2015-09-01

    Low temperature plasma jets emitted in ambient air are the product of fast ionization waves that are guided within a channel of a gas flow, such as helium. This guided ionization wave can be transmitted through a dielectric material and under some conditions can ignite a discharge behind the dielectric material. Here we present a novel way to produce large volume diffuse low pressure plasma inside a Pyrex chamber that does not have any electrodes or electrical energy directly applied to it. The diffuse plasma is ignited inside the chamber by a plasma jet located externally to the chamber and that is physically and electrically unconnected to the chamber. Instead, the plasma jet is just brought in close proximity to the external wall/surface of the chamber or to a dielectric tubing connected to the chamber. The plasma thus generated is diffuse, large volume and with physical and chemical characteristics that are different than the external plasma jet that ignited it. So by using a plasma jet we are able to ``remotely'' ignite volumetric plasma under controlled conditions. This novel method of ``remote'' generation of a low pressure, low temperature diffuse plasma can be useful for various applications including material processing and biomedicine.

  19. Hot QCD equation of state and quark-gluon plasma-- finite quark chemical potential

    CERN Document Server

    Chandra, Vinod

    2008-01-01

    We explore the relevance of a hot QCD equation of state of $O[g^6\\ln(1/g)]$, which has been obtained\\cite{avrn} for non-vanishing quark-chemical potentials to heavy ion collisions. Employing a method proposed in a recent paper \\cite{chandra1}, we use the EOS to determine a host of thermodynamic quantities, the energy density, specific heat, entropy dnesity, and the temperature dependence of screening lengths, with the behaviour of QGP at RHIC and LHC in mind. We also investigate the sensitivity of these observables to the quark chemical potential.

  20. Physico-chemical properties of the potentially oxidative water and its capability of the instrumentation residual layer remotion

    Directory of Open Access Journals (Sweden)

    Daniel Silva-Herzog FLORES

    2006-11-01

    Full Text Available The purpose of the study was to elaborate the potentially oxidative water (POW and analyze some of the physico-chemical properties: pH density, superficial stress, contact angle, conductivity and REDOX potential; besides comparing its POW organic as well as non-organic matter removal capacity with hypochlorite sodium at 1% plus 17% EDTA. For the methodology the POW elaboration an electrolysis process was used and the physico-chemical properties were determined in 0, 1, 3, 5 and 7 days. For the removal capacity of teeth tartarevaluation, 30 extracted uniradicular premolars were used, divided in three groups:positive control (NaOCl at 1% + EDTA at 17%, negative control(distilled water and experimental (POW. Afterwards, the samples were observed under electronic microscopy with 2500x magnifying at the middle thirds and apical, analyzing them with the Rome scale (amount of open dental tubes. For the statistical analysis the Chi-square and the Fisher Exact Proofwas used. The results showed that the solution was constantly maintained at all times during the evaluation and there was found statistical difference between negative control and positive control and between negative control and the experimental group. With regards to the dental tartar removal it was found that there was no statistical difference between the control group and the experimental group (POW; reason why it is concluded that the POW has the capacity to remove dental tartar. Nevertheless, to be able to propose the use of the POW as an irrigator solution in Endodontics it is necessary to do further studies to evaluate its cytotoxicity and biocompability.

  1. Chemical stability and antimicrobial activity of plasma sprayed bioactive Ca2ZnSi2O7 coating.

    Science.gov (United States)

    Li, Kai; Yu, Jiangming; Xie, Youtao; Huang, Liping; Ye, Xiaojian; Zheng, Xuebin

    2011-12-01

    Calcium silicate ceramic coatings have received considerable attention in recent years due to their excellent bioactivity and bonding strength. However, their high dissolution rates limit their practical applications. In this study, zinc incorporated calcium silicate based ceramic Ca(2)ZnSi(2)O(7) coating was prepared on Ti-6Al-4V substrate via plasma spraying technology aiming to achieve higher chemical stability and additional antibacterial activity. Chemical stability of the coating was assessed by monitoring mass loss and ion release of the coating after immersion in the Tris-HCl buffer solution and examining pH value variation of the solution. Results showed that the chemical stability of zinc incorporated coating was improved significantly. Antimicrobial activity of the Ca(2)ZnSi(2)O(7) coating was evaluated, and it was found that the coating exhibited 93% antibacterial ratio against Staphylococcus aureus. In addition, in vitro bioactivity and cytocompatibility were confirmed for the Ca(2)ZnSi(2)O(7) coating by simulated body fluid test, MC3T3-E1 cells adhesion investigation and cytotoxicity assay.

  2. Chemical and plasma surface modification of lignocellulose coconut waste for the preparation of advanced biobased composite materials.

    Science.gov (United States)

    Kocaman, Suheyla; Karaman, Mustafa; Gursoy, Mehmet; Ahmetli, Gulnare

    2017-03-01

    In this study, surface-modified grinded coconut waste (CW) particles were used as bio-fillers to prepare polymeric composite materials with enhanced properties. Epoxy resin modified with acrylated and epoxidized soybean oil (AESO) was used as the polymer matrix. Two different strategies, namely chemical treatment and plasma enhanced chemical vapor deposition (PECVD) were utilized to modify the surface of CW particles for using them as compatible bio-fillers in composite preparation. Chemical modification involved the treatment of CW particles in a highly alkali NaOH solution, while PECVD modification involved coating of a thin film of hydrophobic poly(hexafluorobutyl acrylate) (PHFBA) around individual CW particle surfaces. Untreated and surface-modified CW particles were used in 10-50wt% for preparation of epoxy composites. FTIR analysis was performed to study the effect of modification on the structures of particles and as-prepared composites. The composite morphologies were investigated by XRD and SE. TGA test was conducted to study the thermal behavior of the composites. Also, the effects of CW particle surface modification on the mechanical and water sorption properties of epoxy resin composites were investigated in detail. It was observed that PECVD-treated CW particles had much more positive effects on the thermal, mechanical, wettability and flammability properties of composites. Copyright © 2016 Elsevier Ltd. All rights reserved.

  3. Tailoring the chemical composition and dispersion behavior of fluorinated graphene oxide via CF4 plasma

    Science.gov (United States)

    Zhou, Baoming; Qian, Xiaoming; Li, Mingming; Ma, Jilan; Liu, Liangsen; Hu, Chuansheng; Xu, Zhiwei; Jiao, Xiaoning

    2015-03-01

    Grafting fluorine onto graphene oxide (GO) by CF4 plasma treatment was investigated in this study. An easy, low-cost, and effective synthesis of the high-dispersive fluorinated GO (FGO) with tunable atomic ratio of F/O ( R F/O) has been realized and the R F/O can be readily manipulated just by adjusting the reaction time. The influence of plasma treatment time on the microstructure, morphology, and dispersion of graphene nanosheets was systematically analyzed. X-ray photoelectron spectroscopy analysis confirmed that fluorine has been grafted onto graphene, and the R F/O was gradually increased to 3.54 for the FGO treated for 20 min. Morphology investigation indicated that etching on the edge of GO occurred during the fluorination. The dispersion performance of FGO in water reduced continuously, which in N, N-dimethylacetamide (DMAc) increased firstly and then decreased with the increase in plasma time. The zeta potentials of FGO in DMAc reached the lowest at -28.6 mV when GO was treated for 10 min. The dispersion of FGO in water should be attributed to the decrease of C-O group, while there was a same variation trend of FGO zeta potential in DMAc as the value of C-F content, regardless of R F/O, CF2 group content and CF3 group content. The GO film was super-hydrophilic and the film of FGO treated for 20 min was found to be neither hydrophilic nor hydrophobic.

  4. In vitro characterization of two different atmospheric plasma jet chemical functionalizations of titanium surfaces

    Science.gov (United States)

    Mussano, F.; Genova, T.; Verga Falzacappa, E.; Scopece, P.; Munaron, L.; Rivolo, P.; Mandracci, P.; Benedetti, A.; Carossa, S.; Patelli, A.

    2017-07-01

    Plasma surface activation and plasma polymers deposition are promising technologies capable to modulate biologically relevant surface features of biomaterials. The purpose of this study was to evaluate the biological effects of two different surface modifications, i.e. amine (NH2-Ti) and carboxylic/esteric (COOH/R-Ti) functionalities obtained from 3-aminopropyltriethoxysilane (3-APTES) and methylmethacrylate (MMA) precursors, respectively, through an atmospheric plasma jet RF-APPJ portable equipment. The coatings were characterized by Scanning Electron Microscopy, FT-IR spectroscopy, XPS and surface energy calculations. Stability in water and after UV sterilization were also verified. The pre-osteoblastic murine cell line MC3T3-E1 was used to perform the in-vitro tests. The treated samples showed a higher quantity of adsorbed proteins and improved osteoblast cells adhesion on the surfaces compared to the pristine titanium, in particular the COOH/R-Ti led to a nearly two-fold improvement. Cell proliferation on coated samples was initially (at 24 h) lower than on titanium control, while, at 48 h, COOH/R-Ti reached the proliferation rate of pristine titanium. Cells grown on NH2-Ti were more tapered and elongated in shape with lower areas than on COOH/R-Ti enriched surfaces. Finally, NH2-Ti significantly enhanced osteocalcin production, starting from 14 days, while COOH/R-Ti had this effect only from 21 days. Notably, NH2-Ti was more efficient than COOH/R-Ti at 21 days. The amine functionality elicited the most relevant osteogenic effect in terms of osteocalcin expression, thus establishing an interesting correlation between early cell morphology and later differentiation stages. Taken together, these data encourage the use of the functionalization procedures here reported in further studies.

  5. CHEMICALS

    CERN Document Server

    Medical Service

    2002-01-01

    It is reminded that all persons who use chemicals must inform CERN's Chemistry Service (TIS-GS-GC) and the CERN Medical Service (TIS-ME). Information concerning their toxicity or other hazards as well as the necessary individual and collective protection measures will be provided by these two services. Users must be in possession of a material safety data sheet (MSDS) for each chemical used. These can be obtained by one of several means : the manufacturer of the chemical (legally obliged to supply an MSDS for each chemical delivered) ; CERN's Chemistry Service of the General Safety Group of TIS ; for chemicals and gases available in the CERN Stores the MSDS has been made available via EDH either in pdf format or else via a link to the supplier's web site. Training courses in chemical safety are available for registration via HR-TD. CERN Medical Service : TIS-ME :73186 or service.medical@cern.ch Chemistry Service : TIS-GS-GC : 78546

  6. Modeling the chemical kinetics of atmospheric plasma for cell treatment in a liquid solution

    Energy Technology Data Exchange (ETDEWEB)

    Kim, H. Y.; Kang, S. K.; Lee, H. Wk. [Department of Electrical Engineering, Pohang University of Science and Technology, Pohang 790-784 (Korea, Republic of); Lee, H. W. [Medipl Corporation, Pohang 790-834 (Korea, Republic of); Kim, G. C. [Medipl Corporation, Pohang 790-834 (Korea, Republic of); Department of Oral Anatomy and Cell Biology, School of Dentistry, Pusan National University, Pusan 602-739 (Korea, Republic of); Lee, J. K. [Department of Electrical Engineering, Pohang University of Science and Technology, Pohang 790-784 (Korea, Republic of); Medipl Corporation, Pohang 790-834 (Korea, Republic of)

    2012-07-15

    Low temperature atmospheric pressure plasmas have been known to be effective for living cell inactivation in a liquid solution but it is not clear yet which species are key factors for the cell treatment. Using a global model, we elucidate the processes through which pH level in the solution is changed from neutral to acidic after plasma exposure and key components with pH and air variation. First, pH level in a liquid solution is changed by He{sup +} and He(2{sup 1}S) radicals. Second, O{sub 3} density decreases as pH level in the solution decreases and air concentration decreases. It can be a method of removing O{sub 3} that causes chest pain and damages lung tissue when the density is very high. H{sub 2}O{sub 2}, HO{sub 2}, and NO radicals are found to be key factors for cell inactivation in the solution with pH and air variation.

  7. Glutamate biosensor based on carbon nanowalls grown using plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Tomatsu, Masakazu; Hiramatsu, Mineo; Kondo, Hiroki; Hori, Masaru

    2015-09-01

    Carbon nanowalls (CNWs) are composed of few-layer graphene standing almost vertically on the substrate. Due to the large surface area of vertical nanographene network, CNWs draw attention as platform for electrochemical sensing, biosensing and energy conversion applications. In this work, CNWs were grown on nickel substrate using inductively coupled plasma with methane/Ar mixture. After the CNW growth, the surface of CNWs was oxidized using Ar atmospheric pressure plasma to obtain super-hydrophilic surface. For the biosensing application, the surface of CNWs was decorated with platinum (Pt) nanoparticles by the reduction of hydrogen hexachloroplatinate (IV) solution. The resultant Pt particle size was estimated to be 3-4 nm. From the XPS analysis, pure Pt existed without being oxidized on the CNW surface. Electrochemical surface area of the Pt catalyst was evaluated by cyclic voltammetry. Pt-decorated CNWs will be used as an electrode for electrochemical glutamate biosensing. L-glutamate is one of the most important in the mammalian central nervous system, playing a vital role in many physiological processes. Nanoplatform based on vertical nanographene offers great promise for providing a new class of nanostructured electrodes for electrochemical sensing.

  8. Infrared hyperspectral tunable filter imaging spectrometer for remote leak detection, chemical speciation, and stack/vent analysis applications

    Science.gov (United States)

    Hinnrichs, Michele

    2002-02-01

    With support from the Department of Energy, the State of California and the Gas Technology Institute, Pacific Advanced Technology is developing a small field portable infrared imaging spectrometer (Sherlock) based on the advances in hyperspectral tunable filter technology, that will be applied to the detection of fugitive gas leaks. This imaging spectrometer uses the Image Multi-spectral Sensing (IMSS) diffractive optic tunable filter invented by Pacific Advanced Technology . The Sherlock has an embedded digital signal processor for real time detection of the gas leak while surrounded by severe background noise. The infrared sensor engine is a 256 x 320 midwave cooled focal plane array which spans the spectral range from 3 to 5 microns, ideal for most hydrocarbon leaks. The technology is by no means limited to this spectral region, and can just as easily work in the longwave infrared from 8 to 12 microns for chemical detection applications. This paper will present the design of the Sherlock camera as well as processed data collected at a gas processing plant and an instrumented kiln at LSU using the prototype camera. The processed data shows that the IMSS imaging spectrometer, using an all passive approach, has the sensitivity to detect methane gas leaks at short range with a flow rate as low as 0.01 scfm2. In addition, the IMSS imaging spectrometer can measure hot gas plumes at longer ranges. As will be shown in this paper the IMSS can detect and image warm species gas additives of methane and propane in the Kiln exhaust stack. The methane injected gas with a concentration of 72 ppm and the propane with a concentration of 49 ppm (as seen by the IMSS sensor) at a range of 60 meters. The atmospheric path was a stressing environment, being hot and humid, for any imaging infrared spectrometer.

  9. Intertwisted fibrillar diamond-like carbon films prepared by electron cyclotron resonance microwave plasma enhanced chemical vapour deposition

    Institute of Scientific and Technical Information of China (English)

    杨武保; 王久丽; 张谷令; 范松华; 刘赤子; 杨思泽

    2003-01-01

    In this paper, the structures, optical and mechanical properties of diamond-like carbon films are studied, which are prepared by a self-fabricated electron cyclotron resonance microwave plasma chemical vapour deposition method at room temperature in the ambient gases of mixed acetylene and nitrogen. The morphology and microstructure of the processed film are characterized by the atomic force microscope image, Raman spectra and middle Fourier transform infrared transmittance spectra, which reveal that there is an intertwisted fibrillar diamond-like structure in the film and the film is mainly composed of sp3 CH, sp3 C-C, sp2 C=C, C=N and C60. The film micro-hardness and bulk modulus are measured by a nano-indenter and the refractive constant and deposition rate are also calculated.

  10. Growth of large size diamond single crystals by plasma assisted chemical vapour deposition: Recent achievements and remaining challenges

    Science.gov (United States)

    Tallaire, Alexandre; Achard, Jocelyn; Silva, François; Brinza, Ovidiu; Gicquel, Alix

    2013-02-01

    Diamond is a material with outstanding properties making it particularly suited for high added-value applications such as optical windows, power electronics, radiation detection, quantum information, bio-sensing and many others. Tremendous progresses in its synthesis by microwave plasma assisted chemical vapour deposition have allowed obtaining single crystal optical-grade material with thicknesses of up to a few millimetres. However the requirements in terms of size, purity and crystalline quality are getting more and more difficult to achieve with respect to the forecasted applications, thus pushing the synthesis method to its scientific and technological limits. In this paper, after a short description of the operating principles of the growth technique, the challenges of increasing crystal dimensions both laterally and vertically, decreasing and controlling point and extended defects as well as modulating crystal conductivity by an efficient doping will be detailed before offering some insights into ways to overcome them.

  11. Highly efficient shrinkage of inverted-pyramid silicon nanopores by plasma-enhanced chemical vapor deposition technology

    Science.gov (United States)

    Wang, Yifan; Deng, Tao; Chen, Qi; Liang, Feng; Liu, Zewen

    2016-06-01

    Solid-state nanopore-based analysis systems are currently one of the most attractive and promising platforms in sensing fields. This work presents a highly efficient method to shrink inverted-pyramid silicon nanopores using plasma-enhanced chemical vapor deposition (PECVD) technology by the deposition of SiN x onto the surface of the nanopore. The contraction of the inverted-pyramid silicon nanopores when subjected to the PECVD process has been modeled and carefully analyzed, and the modeling data are in good agreement with the experimental results within a specific PECVD shrinkage period (˜0-600 s). Silicon nanopores within a 50-400 nm size range contract to sub-10 nm dimensions. Additionally, the inner structure of the nanopores after the PECVD process has been analyzed by focused ion beam cutting process. The results show an inner structure morphology change from inverted-pyramid to hourglass, which may enhance the spatial resolution of sensing devices.

  12. Microstructural modification of nc-Si/SiO{sub x} films during plasma-enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, X.W. [State Key Laboratory of Silicon Materials Science, Zhejiang University, Hangzhou 310027 (China)

    2005-07-01

    Nanocrystalline-silicon embedded silicon oxide films are prepared by plasma-enhanced chemical vapor deposition (PECVD) at 300 C without post-heat treatment. Measurements of XPS, IR, XRD, and HREM are performed. Microstructural modifications are found occurring throughout the film deposition. The silica network with a high oxide state is suggested to be formed directly under the abduction of the former deposited layer, rather than processing repeatedly from the original low-oxide state of silica. Nanocrystalline silicon particles with a size of 6-10 nm are embedded in the SiO{sub x} film matrix, indicating the potential application in Si-based optoelectronic integrity. (copyright 2005 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  13. Highly efficient shrinkage of inverted-pyramid silicon nanopores by plasma-enhanced chemical vapor deposition technology.

    Science.gov (United States)

    Wang, Yifan; Deng, Tao; Chen, Qi; Liang, Feng; Liu, Zewen

    2016-06-24

    Solid-state nanopore-based analysis systems are currently one of the most attractive and promising platforms in sensing fields. This work presents a highly efficient method to shrink inverted-pyramid silicon nanopores using plasma-enhanced chemical vapor deposition (PECVD) technology by the deposition of SiN x onto the surface of the nanopore. The contraction of the inverted-pyramid silicon nanopores when subjected to the PECVD process has been modeled and carefully analyzed, and the modeling data are in good agreement with the experimental results within a specific PECVD shrinkage period (∼0-600 s). Silicon nanopores within a 50-400 nm size range contract to sub-10 nm dimensions. Additionally, the inner structure of the nanopores after the PECVD process has been analyzed by focused ion beam cutting process. The results show an inner structure morphology change from inverted-pyramid to hourglass, which may enhance the spatial resolution of sensing devices.

  14. Room-Temperature Ferromagnetic ZnMnO Thin Films Synthesized by Plasma Enhanced Chemical Vapour Deposition Method

    Institute of Scientific and Technical Information of China (English)

    LIN Ying-Bin; ZHANG Feng-Ming; DU You-Wei; HUANG Zhi-Gao; ZHENG Jian-Guo; LU Zhi-Hai; ZOU Wen-Qin; LU Zhong-Lin; XU Jian-Ping; JI Jian-Ti; LIU Xing-Chong; WANG Jian-Feng; LV Li-Ya

    2007-01-01

    Room-temperature ferromagnetic Mn-doped ZnO films are grown on Si (001) substrates by plasma enhanced chemical vapour deposition (PECVD). X-ray diffraction measurements reveal that the Zn1-xMnxO films have the single-phase wurtzite structure. X-ray photoelectron spectroscopy indicates the existence of Mn2+ ions in Mndoped ZnO films. Furthermore, the decreasing additional Raman peak with increasing Mn-doping is considered to relate to the substitution of Mn ions for the Zn ions in ZnO lattice. Superconducting quantum interference device (SQUID) measurements demonstrate that Mn-doped ZnO films have ferromagnetic behaviour at room temperature.

  15. Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

    Science.gov (United States)

    Wang, Qi; Wang, Chengbing; Wang, Zhou; Zhang, Junyan; He, Deyan

    2008-12-01

    Hydrogenated amorphous carbon films were prepared on Si (1 0 0) substrates by dc-pulse plasma chemical vapor deposition. The nature of the deposited films was characterized by Raman spectra and the stress relief patterns were observed by scanning electron microscope. Besides the well-known sinusoidal type and flower type patterns, etc., two different stress relief patterns, ring type and peg-top shape with exiguous tine on the top, were observed. The ring type in this paper was a clear ridge-cracked buckle and unusual. Two competing buckle delamination morphologies ring and sinusoidal buckling coexist. The ridge-cracked buckle in ring type was narrower than the sinusoidal buckling. Meanwhile peg-top shape with exiguous tine on the top in this paper was unusual. These different patterns supported the approach in which the stress relief forms have been analyzed using the theory of plate buckling.

  16. Interaction of plasma-generated water cluster ions with chemically-modified Si surfaces investigated by infrared absorption spectroscopy

    Directory of Open Access Journals (Sweden)

    Ayumi Hirano-Iwata

    2016-03-01

    Full Text Available We have investigated the interaction of water cluster ions generated by discharge plasma, with chemically modified Si surfaces using infrared absorption spectroscopy in the multiple internal reflection geometry. We observe that water cluster ions readily adsorb on SiO2-covered Si surfaces to form water droplets. We demonstrate that positively- and negatively-charged cluster ions adsorb on the SiO2-covered Si surface in different manners, indicating ionic interaction of the water droplets with the negatively-charged SiO2 surface. Water droplets formed on the protein-coated surface rupture the amide bond of the proteins, suggesting the function of protein decomposition of water cluster ions.

  17. Properties of Erbium Doped Hydrogenated Amorphous Carbon Layers Fabricated by Sputtering and Plasma Assisted Chemical Vapor Deposition

    Directory of Open Access Journals (Sweden)

    V. Prajzler

    2008-01-01

    Full Text Available We report about properties of carbon layers doped with Er3+ ions fabricated by Plasma Assisted Chemical Vapor Deposition (PACVD and by sputtering on silicon or glass substrates. The structure of the samples was characterized by X-ray diffraction and their composition was determined by Rutherford Backscattering Spectroscopy and Elastic Recoil Detection Analysis. The Absorbance spectrum was taken in the spectral range from 400 nm to 600 nm. Photoluminescence spectra were obtained using two types of Ar laser (λex=514.5 nm, lex=488 nm and also using a semiconductor laser (λex=980 nm. Samples fabricated by magnetron sputtering exhibited typical emission at 1530 nm when pumped at 514.5 nm. 

  18. Interaction of plasma-generated water cluster ions with chemically-modified Si surfaces investigated by infrared absorption spectroscopy

    Science.gov (United States)

    Hirano-Iwata, Ayumi; Matsumura, Ryosuke; Ma, Teng; Kimura, Yasuo; Niwano, Michio; Nishikawa, Kazuo

    2016-03-01

    We have investigated the interaction of water cluster ions generated by discharge plasma, with chemically modified Si surfaces using infrared absorption spectroscopy in the multiple internal reflection geometry. We observe that water cluster ions readily adsorb on SiO2-covered Si surfaces to form water droplets. We demonstrate that positively- and negatively-charged cluster ions adsorb on the SiO2-covered Si surface in different manners, indicating ionic interaction of the water droplets with the negatively-charged SiO2 surface. Water droplets formed on the protein-coated surface rupture the amide bond of the proteins, suggesting the function of protein decomposition of water cluster ions.

  19. The importance of recording physical and chemical variables simultaneously with remote radiological surveillance of aquatic systems: a perspective for environmental modelling.

    Science.gov (United States)

    Abril, J M; El-Mrabet, R; Barros, H

    2004-01-01

    Modern nuclear metrological tools allow the remote surveillance of the radiological status of the aquatic systems, providing an important advance in the protection of the environment. Nevertheless, the significance of the radiological data could be highly improved through simultaneous recording of physical and chemical variables that govern the behaviour and bioavailability of radionuclides in these aquatic systems. This work reviews some of these variables from the point of view of the environmental modelling. The amount, nature and dynamics of the suspended loads and bottom sediments strongly influence the behaviour of particle-reactive radionuclides. The kinetics of this process has a very fast component, as it is shown from our recent studies with 241Am, 239Pu and 133Ba in several aquatic systems from southern Spain. Changes in pH, temperature and in the electrical conductivity are influencing the uptake kinetics and the final partitioning of the radioactivity. Water currents govern the radionuclide transport and dispersion. These points are illustrated with modelling exercises in the scenarios of the Suez Canal (Egypt) and the Härsvatten Lake (Sweden).

  20. Microwave plasma assisted chemical vapor deposition of ultra-nanocrystalline diamond films

    Science.gov (United States)

    Huang, Wen-Shin

    Microwave plasma assisted ultra-nanocrystalline diamond film deposition was investigated using hydrogen deficient, carbon containing argon plasma chemistries with MSU-developed microwave plasma reactors. Ultra-nanocrystalline diamond film deposition on mechanically scratched silicon wafers was experimentally explored over the following input variables: (1) pressure: 60--240Torr, (2) total gas flow rate: 101--642 sccm, (3) input microwave power 732--1518W, (4) substrate temperature: 500°C--770°C, (5) deposition time: 2--48 hours, and (6) N2 impurities 5--2500 ppm. H2 concentrations were less than 9%, while CH 4 concentration was 0.17--1.85%. It was desired to grow films uniformly over 3″ diameter substrates and to minimize the grain size. Large, uniform, intense, and greenish-white discharges were sustained in contact with three inch silicon substrates over a 60--240 Torr pressure regime. At a given operating pressure, film uniformity was controlled by adjusting substrate holder geometry, substrate position, input microwave power, gas chemistries, and total gas flow rates. Film ultra-nanocrystallinity and smoothness required high purity deposition conditions. Uniform ultra-nanocrystalline films were synthesized in low leak-rate system with crystal sizes ranging from 3--30 nm. Films with 11--50 nm RMS roughness and respective thickness values of 1--23 mum were synthesized over 3″ wafers under a wide range of different deposition conditions. Film RMS roughness 7 nm was synthesized with thickness of 430 nm. Film uniformities of almost 100% were achieved over three inch silicon wafers. UV Raman and XRD characterization results indicated the presence of diamond in the synthesized films. Optical Emission Spectroscopy measurements showed that the discharge gas temperature was in excess of 2000 K. The synthesized films are uniformly smooth and the as grown ultra-nanocrystalline diamond can be used for a high frequency SAW device substrate material. IR measurements

  1. Effect of the plasma-chemical treatment of ZnO and NiO on their activity in the dehydrogenation of isopropanol

    Science.gov (United States)

    Danilova, M. N.; Pylinina, A. I.; Platonov, E. A.; Yagodovskii, V. D.

    2015-08-01

    Treating ZnO and NiO oxides with glow discharge oxygen plasma and high-frequency argon plasma is found to affect the catalytic activity of these oxides in the dehydrogenation reaction of isopropanol, leading to an increase in the conversion of alcohol and the yield of acetone. The increased activity of ZnO is due to the high number of acid sites induced by plasma-chemical treatment. With NiO, the increased activity results from the formation of new, more active sites with low experimental activation energy, rather than a change in the surface acidity.

  2. Wetting, Solubility and Chemical Characteristics of Plasma-Polymerized 1-Isopropyl-4-Methyl-1,4-Cyclohexadiene Thin Films

    Directory of Open Access Journals (Sweden)

    Jakaria Ahmad

    2014-07-01

    Full Text Available Investigations on the wetting, solubility and chemical composition of plasma polymer thin films provide an insight into the feasibility of implementing these polymeric materials in organic electronics, particularly where wet solution processing is involved. In this study, thin films were prepared from 1-isopropyl-4-methyl-1,4-cyclohexadiene (γ-Terpinene using radio frequency (RF plasma polymerization. FTIR showed the polymers to be structurally dissimilar to the original monomer and highly cross-linked, where the loss of original functional groups and the degree of cross-linking increased with deposition power. The polymer surfaces were hydrocarbon-rich, with oxygen present in the form of O–H and C=O functional groups. The oxygen content decreased with deposition power, with films becoming more hydrophobic and, thus, less wettable. The advancing and receding contact angles were investigated, and the water advancing contact angle was found to increase from 63.14° to 73.53° for thin films prepared with an RF power of 10 W to 75 W. The wetting envelopes for the surfaces were constructed to enable the prediction of the surfaces’ wettability for other solvents. The effect of roughness on the wetting behaviour of the films was insignificant. The polymers were determined to resist solubilization in solvents commonly used in the deposition of organic semiconducting layers, including chloroform and chlorobenzene, with higher stability observed in films fabricated at higher RF power.

  3. Catalytic Carbon Submicron Fabrication Using Home-Built Very-High Frequency Plasma Enhanced Chemical Vapour Deposition

    Directory of Open Access Journals (Sweden)

    Sukirno

    2008-09-01

    Full Text Available In this research, carbon nanotubes (CNT fabrication is attempted by using existing home-made Plasma Enhanced Chemical Vapour Deposition (PECVD system. The fabrication is a catalytic growth process, which Fe catalyst thin film is grown on the Silicon substrate by using dc-Unbalanced Magnetron Sputtering method. By using methane (CH4 as the source of carbon and diluted silane (SiH4 in hydrogen as the source of hydrogen with 10:1 ratio, CNT fabrications have been attempted by using Very High Frequency PECVD (VHF-PECVD method. The fabrication processes are done at relatively low temperature, 250oC, but with higher operated plasma frequency, 70 MHz. Recently, it is also been attempted a fabrication process with only single gas source, but using one of the modification of the VHF-PECVD system, which is by adding hot-wire component. The attempt was done in higher growth temperature, 400oC. Morphological characterizations, by using Scanning Electron Micrograph (SEM and Scanning Probe Microscopy (SPM, as well as the composition characterization, by using Energy Dispersion Analysis by X-Ray (EDAX, show convincing results that there are some signatures of CNT present.

  4. [LC-LTQ-Orbitrap analysis on chemical constituents in Scrophulariae Radix extract and their metabolites in rat plasma].

    Science.gov (United States)

    Xu, Duo-Duo; Pang, Huan-Huan; Jiang, Mei-Fang; Jian, Wei-Jie; Wang, Qin-Hui; Sun, Lu; Dong, Zi-Yi; Huang, Jian-Mei

    2016-02-01

    Chemical constituents in extract of Scrophulariae Radix and their metabolites in rat plasma after oral administration were identified by HPLC-LTQ-Orbitrap. Samples were separated by a Venusil MP C₁₈ column using a binary gradient elution. The information on the total ion chromatogram, the extraction chromatogram and the mass spectrogram in a negative mode were synthetically analyzed by comparing the retention time, MS and MS/MS spectra with literature data and some of reference standards to conduct a qualitative study on constituents of Radix Scrophulariae extract in vivo and in vitro. Totally 37 compounds from Scrophularia ningpoensis extract were detected including 12 iridoid glycosides, 20 phenylpropanoids and 5 unknown compounds. In vivo, harpagide, harpagoside and angoroside C were confirmed to enter into the blood in prototype forms. Besides, another 2 prototype compounds and 2 metabolites were detected in rat plasma after oral administration of S. ningpoensis extract. The results are beneficial for the determination of bioactive substances of S. ningpoensis and significant for further studies on S. ningpoensis. Copyright© by the Chinese Pharmaceutical Association.

  5. Development of a new chemical sensor based on plasma polymerized polypyrrole films

    OpenAIRE

    2010-01-01

    La present tesis contribueix a donar una nova visió dins de l'àrea de modificació de superfícies, la qual implica la nanoestructuració de substrats fent servir la tècnica d'auto-assemblatge per a dipositar sobre aquests un polímer conductor mitjançant deposició química en fase vapor per plasma. L'ús de polímers conductors ha despertat un creixent interès en el desenvolupament de sensors químics per a l'anàlisi de gasos en aplicacions d'enginyeria electrònica. La contínua reducció de mida en a...

  6. Chemical and physical characteristics of aerosol particles at a remote coastal location, Mace Head, Ireland, during NAMBLEX

    Directory of Open Access Journals (Sweden)

    H. Coe

    2006-01-01

    Full Text Available A suite of aerosol physical and chemical measurements were made at the Mace Head Atmospheric Research Station, Co. Galway, Ireland, a coastal site on the eastern seaboard of the north Atlantic Ocean during NAMBLEX. The data have been used in this paper to show that over a wide range of aerosol sizes there is no impact of the inter-tidal zone or the surf zone on measurements made at 7 m above ground level or higher. During the measurement period a range of air mass types were observed. During anticyclonic periods and conditions of continental outflow Aitken and accumulation mode were enhanced by a factor of 5 compared to the marine sector, whilst coarse mode particles were enhanced during westerly conditions. Baseline marine conditions were rarely met at Mace Head during NAMBLEX and high wind speeds were observed for brief periods only. The NAMBLEX experiment focussed on a detailed assessment of photochemistry in the marine environment, investigating the linkage between the HOx and the halogen radical cycles. Heterogeneous losses are important in both these cycles. In this paper loss rates of gaseous species to aerosol surfaces were calculated for a range of uptake coefficients. Even when the accommodation coefficient is unity, lifetimes due to heterogeneous loss of less than 10 s were never observed and rarely were they less than 500 s. Diffusional limitation to mass transfer is important in most conditions as the coarse mode is always significant. We calculate a minimum overestimate of 50% in the loss rate if this is neglected and so it should always be considered when calculating loss rates of gaseous species to particle surfaces. HO2 and HOI have accommodation coefficients of around 0.03 and hence we calculate lifetimes due to loss to particle surfaces of 2000 s or greater under the conditions experienced during NAMBLEX. Aerosol composition data collected during this experiment provide representative information on the input aerosol

  7. Remote Research

    CERN Document Server

    Tulathimutte, Tony

    2011-01-01

    Remote studies allow you to recruit subjects quickly, cheaply, and immediately, and give you the opportunity to observe users as they behave naturally in their own environment. In Remote Research, Nate Bolt and Tony Tulathimutte teach you how to design and conduct remote research studies, top to bottom, with little more than a phone and a laptop.

  8. Ti-doped hydrogenated diamond like carbon coating deposited by hybrid physical vapor deposition and plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Lee, Na Rae; Sle Jun, Yee; Moon, Kyoung Il; Sunyong Lee, Caroline

    2017-03-01

    Diamond-like carbon films containing titanium and hydrogen (Ti-doped DLC:H) were synthesized using a hybrid technique based on physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD). The film was deposited under a mixture of argon (Ar) and acetylene gas (C2H2). The amount of Ti in the Ti-doped DLC:H film was controlled by varying the DC power of the Ti sputtering target ranging from 0 to 240 W. The composition, microstructure, mechanical and chemical properties of Ti-doped DLC:H films with varying Ti concentrations, were investigated using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), nano indentation, a ball-on-disk tribometer, a four-point probe system and dynamic anodic testing. As a result, the optimum composition of Ti in Ti-doped DLC:H film using our hybrid method was found to be a Ti content of 18 at. %, having superior electrical conductivity and high corrosion resistance, suitable for bipolar plates. Its hardness value was measured to be 25.6 GPa with a low friction factor.

  9. Plasma-enhanced chemical vapor deposition of low- loss as-grown germanosilicate layers for optical waveguides

    Science.gov (United States)

    Ay, Feridun; Agan, Sedat; Aydinli, Atilla

    2004-08-01

    We report on systematic growth and characterization of low-loss germanosilicate layers for use in optical waveguides. Plasma enhanced chemical vapor deposition (PECVD) technique was used to grow the films using silane, germane and nitrous oxide as precursor gases. Chemical composition was monitored by Fourier transform infrared (FTIR) spectroscopy. N-H bond concentration of the films decreased from 0.43x1022 cm-3 down to below 0.06x1022 cm-3, by a factor of seven as the GeH4 flow rate increased from 0 to 70 sccm. A simultaneous decrease of O-H related bonds was also observed by a factor of 10 in the same germane flow range. The measured TE rate increased from 5 to 50 sccm, respectively. In contrast, the propagation loss values for TE polarization at λ=632.8 nm were found to increase from are 0.20 +/- 0.02 to 6.46 +/- 0.04 dB/cm as the germane flow rate increased from 5 to 50 sccm, respectively. In contrast, the propagation loss values for TE polarization at λ=1550 nm were found to decrease from 0.32 +/- 0.03 down to 0.14 +/- 0.06 dB/cm for the same samples leading to the lowest values reported so far in the literature, eliminating the need for high temperature annealing as is usually done for these materials to be used in waveguide devices.

  10. Hot bubbles of planetary nebulae with hydrogen-deficient winds I. Heat conduction in a chemically stratified plasma

    CERN Document Server

    Sandin, Christer; Schönberner, Detlef; Rühling, Ute

    2016-01-01

    Heat conduction has been found a plausible solution to explain discrepancies between expected and measured temperatures in hot bubbles of planetary nebulae (PNe). While the heat conduction process depends on the chemical composition, to date it has been exclusively studied for pure hydrogen plasmas in PNe. A smaller population of PNe show hydrogen-deficient and helium- and carbon-enriched surfaces surrounded by bubbles of the same composition; considerable differences are expected in physical properties of these objects in comparison to the pure hydrogen case. The aim of this study is to explore how a chemistry-dependent formulation of the heat conduction affects physical properties and how it affects the X-ray emission from PN bubbles of hydrogen-deficient stars. We extend the description of heat conduction in our radiation hydrodynamics code to work with any chemical composition. We then compare the bubble-formation process with a representative PN model using both the new and the old descriptions. We also ...

  11. Plasma-enhanced chemical vapor deposition of ortho-carborane: structural insights and interaction with Cu overlayers.

    Science.gov (United States)

    James, Robinson; Pasquale, Frank L; Kelber, Jeffry A

    2013-09-01

    X-ray and ultraviolet photoelectron spectroscopy (XPS, UPS) are used to investigate the chemical and electronic structure of boron carbide films deposited from ortho-carborane precursors using plasma-enhanced chemical vapor deposition (PECVD), and the reactivity of PECVD films toward sputter-deposited Cu overlayers. The XPS data provide clear evidence of enhanced ortho-carborane reactivity with the substrate, and of extra-icosahedral boron and carbon species; these results differ from results for films formed by condensation and electron beam induced cross-linking of ortho-carborane (EBIC films). The UPS data show that the valence band maximum for PECVD films is ∼1.5 eV closer to the Fermi level than for EBIC films. The XPS data also indicate that PECVD films are resistant to thermally-stimulated diffusion of Cu at temperatures up to 1000 K in UHV, in direct contrast to recently reported results, but important for applications in neutron detection and in microelectronics.

  12. SiC-Si[sub 3]N[sub 4] composite coatings produced by plasma-enhanced chemical vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Gerretsen, J. (Centre for Technical Ceramics, Netherlands Organization for Applied Scientific Research, Eindhoven (Netherlands)); Kirchner, G. (Centre for Technical Ceramics, Netherlands Organization for Applied Scientific Research, Eindhoven (Netherlands)); Kelly, T. (Irish Science and Technology Agency, Dublin (Ireland)); Mernagh, V. (Irish Science and Technology Agency, Dublin (Ireland)); Koekoek, R. (Tempress, Hoogeveen (Netherlands)); McDonnell, L. (Tekscan Ltd., Cork (Ireland))

    1993-10-08

    Silicon carbonitride coatings have been produced by plasma-enhanced chemical vapour deposition (CVD) on AISI 440C steel in a hot-wall reactor at 250 C from a mixture of SiH[sub 4], N[sub 2]-NH[sub 3] and C[sub 2]H[sub 4], and analysed by electron probe microanalysis and Rutherford backscattering spectroscopy-elastic recoil detection. Coatings with different ratios of silicon carbide to silicon nitride and silicon suband superstoichiometries have been deposited. Stoichiometric coatings show a maximum in their mechanical properties. Depending on the SiC-to-Si[sub 3]N[sub 4] ratio, the Knoop hardness values vary between 1500 and 2800 HK[sub 0.025]. Internal stress is low at a level of 100-300 MPa. The pinhole density is less than 2 cm[sup -2]. The fracture toughness as determined from indention tests is 4 MPa m[sup 1/2]. Linear polarization testing results show excellent protection of the substrate material against chemically aggressive media as compared with conventional CVD. (orig.)

  13. Cell proliferation on modified DLC thin films prepared by plasma enhanced chemical vapor deposition.

    Science.gov (United States)

    Stoica, Adrian; Manakhov, Anton; Polčák, Josef; Ondračka, Pavel; Buršíková, Vilma; Zajíčková, Renata; Medalová, Jiřina; Zajíčková, Lenka

    2015-06-12

    Recently, diamondlike carbon (DLC) thin films have gained interest for biological applications, such as hip and dental prostheses or heart valves and coronary stents, thanks to their high strength and stability. However, the biocompatibility of the DLC is still questionable due to its low wettability and possible mechanical failure (delamination). In this work, DLC:N:O and DLC: SiOx thin films were comparatively investigated with respect to cell proliferation. Thin DLC films with an addition of N, O, and Si were prepared by plasma enhanced CVD from mixtures of methane, hydrogen, and hexamethyldisiloxane. The films were optically characterized by infrared spectroscopy and ellipsometry in UV-visible spectrum. The thickness and the optical properties were obtained from the ellipsometric measurements. Atomic composition of the films was determined by Rutherford backscattering spectroscopy combined with elastic recoil detection analysis and by x-ray photoelectron spectroscopy. The mechanical properties of the films were studied by depth sensing indentation technique. The number of cells that proliferate on the surface of the prepared DLC films and on control culture dishes were compared and correlated with the properties of as-deposited and aged films. The authors found that the level of cell proliferation on the coated dishes was high, comparable to the untreated (control) samples. The prepared DLC films were stable and no decrease of the biocompatibility was observed for the samples aged at ambient conditions.

  14. Cement clinker structure during plasma-chemical synthesis and its influence on cement properties

    Science.gov (United States)

    Sazonova, N.; Skripnikova, N.; Lucenko, A.; Novikova, L.

    2015-01-01

    The aim of this study was to determine the degree of influence of cement clinker cooling modes, synthesized in a low-temperature plasma, its structure and physico-mechanical properties. The raw mixture consisting of marble, sand, ash from thermal power plants and py- rite cinders were used, which are characterized by saturation factor (1,045); silicate (2,35) and alumina (1,22) modules. It was found that the use of different cooling rates of fused cement clinker entails changes associated with the mineralogical composition (increase of alite of 8.719,2 %), morphology (variation of the mineral alite aspect ratio of 6,7-17,5), density of the structure (change in distance between the minerals from 1 to 7,5 microns), grindability, specific surface area (2600-3650 cm2/g) and, in consequence, the activity of cement (56,973,2 MPa). Disorientation of alite mineral blocks against each other, a significant amount of microcracks, affect the increase in cement specific surface area of 14,3-21,6 %, which leads to activity growth of the system. Along with this, with the rapid cooling of the samples, alite 54CaO- 16SiO2-Al2O3 MgO is formed, with single units of the structure, more deformed relatively to C3S, which has a positive effect on the hydraulic cement activity.

  15. Physical and chemical interactions at the interface between atmospheric pressure plasmas and aqueous solutions

    Science.gov (United States)

    Lindsay, Alexander; Byrns, Brandon; Knappe, Detlef; Graves, David; Shannon, Steven

    2014-10-01

    Transport and reactions of charged species, neutrals, and photons at the interface between plasmas and liquids must be better quantified. The work presented here combines theoretical and experimental investigations of conditions in the gas and liquid phases in proximity to the interface for various discharges. OES is used to determine rotational and vibrational temperatures of OH, NO, and N2+; the relationship between these temperatures that characterize the distribution of internal energy states and gas and electron kinetic temperatures is considered. The deviation of OH rotational states from equilibrium under high humidity conditions is also presented. In contradiction with findings of other groups, high energy rotational states appear to become underpopulated with increasing humidity. In the aqueous phase, concentrations of longer-lived species such as nitrate, nitrite, hydrogen peroxide, and ozone are determined using ion chromatography and colorimetric methods. Spin-traps and electron paramagnetic resonance (EPR) are investigated for characterization of short-lived aqueous radicals like OH, O2-, NO, and ONOO-. Finally, experimental results are compared to a numerical model which couples transport and reactions within and between the bulk gas and liquid phases.

  16. Comparison of diamond growth with different gas mixtures in microwave plasma asssited chemical vapor deposition (MWCVD

    Directory of Open Access Journals (Sweden)

    Corat Evaldo J.

    2003-01-01

    Full Text Available In this work we study the influence of oxygen addition to several halocarbon-hydrogen gas systems. Diamond growth have been performed in a high power density MWCVD reactor built in our laboratory. The growth experiments are monitored by argon actinometry as a reference to plasma temperature and atomic hydrogen production, and by mass spectrometry to compare the exhaust gas composition. Atomic hydrogen actinometry revealed that the halogen presence in the gas phase is responsible for a considerable increase of atomic hydrogen concentration in the gas phase. Mass spectrometry shows similar results for all gas mixtures tested. Growth studies with oxygen addition to CF4/H2, CCl4/H2, CCl2F2/H2 and CH3Cl/H2 reveals that oxygen increases the carbon solubility in the gas phase but no better diamond growth conditions were found. Halogens are not, per se, eligible for diamond growth. All the possible advantages, as the higher production of atomic hydrogen, have been suppressed by the low carbon solubility in the gas phase, even when oxygen is added. The diamond growth with small amount of CF4 added to CH4/H2 mixture is not aggressive to the apparatus but brings several advantages to the process.

  17. Remote Sensing

    CERN Document Server

    Khorram, Siamak; Koch, Frank H; van der Wiele, Cynthia F

    2012-01-01

    Remote Sensing provides information on how remote sensing relates to the natural resources inventory, management, and monitoring, as well as environmental concerns. It explains the role of this new technology in current global challenges. "Remote Sensing" will discuss remotely sensed data application payloads and platforms, along with the methodologies involving image processing techniques as applied to remotely sensed data. This title provides information on image classification techniques and image registration, data integration, and data fusion techniques. How this technology applies to natural resources and environmental concerns will also be discussed.

  18. FTIR spectroscopy of cysteine as a ready-to-use method for the investigation of plasma-induced chemical modifications of macromolecules

    Science.gov (United States)

    Kogelheide, Friederike; Kartaschew, Konstantin; Strack, Martin; Baldus, Sabrina; Metzler-Nolte, Nils; Havenith, Martina; Awakowicz, Peter; Stapelmann, Katharina; Lackmann, Jan-Wilm

    2016-03-01

    A rapid screening method for the investigation of plasma-induced chemical modifications was developed by analyzing cysteine using Fourier Transform Infrared (FTIR) spectroscopy. Cysteine is a key amino acid in proteins due to the presence of a thiol group which provides unique structural features by offering the possibility to form disulfide bonds. Its chemical composition makes cysteine a well-suited model for the investigation of plasma-induced modifications at three functional groups—the amino, the carboxyl and the thiol group—all highly abundant in proteins. FTIR spectroscopy is present in most physical laboratories and offers a fast way to assess changes in the chemical composition of cysteine substrates due to plasma treatment and to compare different treatment conditions or plasma sources with each other. Significant changes in the fingerprint spectra of cysteine samples treated with a dielectric barrier discharge (DBD) compared to untreated controls were observed using a FTIR spectrometer. The loss of the thiol signal and the simultaneous increase of bands originating from oxidized sulfur and nitrogen species indicate that the thiol group of cysteine is modified by reactive oxygen and nitrogen species during DBD treatment. Furthermore, other plasma-induced modifications, such as changes of the amino and carbonyl groups, could be observed. Complementary mass spectrometry measurements confirmed these results.

  19. Invited article: physical and chemical analyses of impregnated cathodes operated in a plasma environment.

    Science.gov (United States)

    Sengupta, Anita; Kulleck, James; Hill, Norm; Ohlinger, Wayne

    2008-11-01

    Destructive analyses of impregnated-cathode assemblies from an ion thruster life test were performed to characterize erosion and degradation after 30,472 h of operation. Post-test inspection of each cathode included examination of the emitter (insert), orifice plate, cathode tube, heater, anode assembly, insulator, and propellant isolator. The discharge-cathode assembly experienced significant erosion due to ion sputtering from the discharge plasma. The keeper electrode plate was removed and the heater and orifice plate were heavily eroded at the conclusion of the test. Had the test continued, these processes would likely have led to cathode failure. The discharge cathode insert experienced significant tungsten transport and temperature dependent barium oxide depletion within the matrix. Using barium depletion semiempirical relations developed by Palluel and Shroff, it is estimated that 25,000 h of operation remained in the discharge insert at the conclusion of the test. In contrast, the neutralizer insert exhibited significantly less tungsten transport and barium oxide depletion consistent with its lower current operation. The neutralizer was estimated to have 140,000 h of insert life remaining at the conclusion of the test. Neither insert had evidence of tungstate or oxide layer formation, previously known to have impeded cathode ignition and operation in similar long duration hollow-cathode tests. The neutralizer cathode was in excellent condition at the conclusion of the test with the exception of keeper tube erosion from direct plume-ion impingement, a previously underappreciated life-limiting mechanism. The most critical finding from the test was a power dependent deposition process within the neutralizer-cathode orifice. The process manifested at low-power operation and led to the production of energetic ions in the neutralizer plume, a potential life-limiting process for the neutralizer. Subsequent return of the engine and neutralizer operation to full

  20. Towards Ideal NOx and CO2 Emission Control Technology for Bio-Oils Combustion Energy System Using a Plasma-Chemical Hybrid Process

    Science.gov (United States)

    Okubo, M.; Fujishima, H.; Yamato, Y.; Kuroki, T.; Tanaka, A.; Otsuka, K.

    2013-03-01

    A pilot-scale low-emission boiler system consisting of a bio-fuel boiler and plasma-chemical hybrid NOx removal system is investigated. This system can achieve carbon neutrality because the bio-fuel boiler uses waste vegetable oil as one of the fuels. The plasma-chemical hybrid NOx removal system has two processes: NO oxidation by ozone produced from plasma ozonizers and NO2 removal using a Na2SO3 chemical scrubber. Test demonstrations of the system are carried out for mixed oils (mixture of A-heavy oil and waste vegetable oil). Stable combustion is achieved for the mixed oil (20 - 50% waste vegetable oil). Properties of flue gas—e.g., O2, CO2 and NOx—when firing mixed oils are nearly the same as those when firing heavy oil for an average flue gas flow rate of 1000 Nm3/h. NOx concentrations at the boiler outlet are 90 - 95 ppm. Furthermore, during a 300-min continuous operation when firing 20% mixed oil, NOx removal efficiency of more than 90% (less than 10 ppm NOx emission) is confirmed. In addition, the CO2 reduction when heavy oil is replaced with waste vegetable oil is estimated. The system comparison is described between the plasma-chemical hybrid NOx removal and the conventional technology.

  1. Design concept of conducting shell and in-vessel components suitable for plasma vertical stability and remote maintenance scheme in DEMO reactor

    Energy Technology Data Exchange (ETDEWEB)

    Utoh, Hiroyasu, E-mail: uto.hiroyasu@jaea.go.jp [Japan Atomic Energy Agency, Obuchi, Rokkasho-mura, Aomori-ken 039-3212 (Japan); International Fusion Energy Research Centre, 2-166, Obuchi, Rokkasho, Aomori 039-3212 (Japan); Takase, Haruhiko [Japan Atomic Energy Agency, Obuchi, Rokkasho-mura, Aomori-ken 039-3212 (Japan); International Fusion Energy Research Centre, 2-166, Obuchi, Rokkasho, Aomori 039-3212 (Japan); Sakamoto, Yoshiteru; Tobita, Kenji [Japan Atomic Energy Agency, Obuchi, Rokkasho-mura, Aomori-ken 039-3212 (Japan); Mori, Kazuo; Kudo, Tatsuya [Japan Atomic Energy Agency, Obuchi, Rokkasho-mura, Aomori-ken 039-3212 (Japan); International Fusion Energy Research Centre, 2-166, Obuchi, Rokkasho, Aomori 039-3212 (Japan); Someya, Youji; Asakura, Nobuyuki; Hoshino, Kazuo; Nakamura, Makoto; Tokunaga, Shinsuke [Japan Atomic Energy Agency, Obuchi, Rokkasho-mura, Aomori-ken 039-3212 (Japan)

    2016-02-15

    Highlights: • Conceptual design of in-vessel component including conducting shell has been investigated. • The conducting shell design for plasma vertical stability was clarified from the plasma vertical stability analysis. • The calculation results showed that the double-loop shell has the most effect on plasma vertical stability. - Abstract: In order to realize a feasible DEMO, we designed an in-vessel component including the conducting shell. The project is affiliated with the broader approach DEMO design activities and is conceptualized from a plasma vertical stability and engineering viewpoint. The dependence of the plasma vertical stability on the conducing shell parameters and the electromagnetic force at plasma disruption were investigated in numerical simulations (programmed in the 3D eddy current analysis code and a plasma position control code). The simulations assumed the actual shape and position of the vacuum vessel and in-vessel components. The plasma vertical stability was most effectively maintained by the double-loop shell.

  2. Direct measurements of the energy flux due to chemical reactions at the surface of a silicon sample interacting with a SF6 plasma

    CERN Document Server

    Dussart, Remi; Pichon, Laurianne E; Bedra, Larbi; Semmar, Nadjib; Lefaucheux, Philippe; Mathias, Jacky; Tessier, Yves; 10.1063/1.2995988

    2008-01-01

    Energy exchanges due to chemical reactions between a silicon surface and a SF6 plasma were directly measured using a heat flux microsensor (HFM). The energy flux evolution was compared with those obtained when only few reactions occur at the surface to show the part of chemical reactions. At 800 W, the measured energy flux due to chemical reactions is estimated at about 7 W.cm\\^{-2} against 0.4 W.cm\\^{-2} for ion bombardment and other contributions. Time evolution of the HFM signal is also studied. The molar enthalpy of the reaction giving SiF4 molecules was evaluated and is consistent with values given in literature.

  3. Dependence of aerosol scattering coefficients on relative humidity observed at two coastal sites on the East China Sea: Comparison to remote observations and influence of chemical composition

    Science.gov (United States)

    Kanaya, Y.; Taketani, F.; Irie, H.; Komazaki, Y.; Takashima, H.; Xiaole, P.; Takami, A.; Wang, Z.

    2011-12-01

    We employed an integrating nephelometer equipped with a humidifier (where the relative humidity (RH) was scanned between 40 and 90%) to measure the aerosol scattering coefficients and their dependence on RH at Fukue Island (32.75N, 128.68E), west of Japan, in May 2009 and at Rudong, Jiangsu, China (32.26N, 121.37E) in May/June 2010, aiming at better characterization of optical properties of the regional-scale aerosol pollution over East Asia. The two coastal sites are located east and west of the East China Sea and are separated by about 700 km. The observed scattering coefficients are normalized by the concurrently measured PM2.5 mass concentrations and thereby behaviors of the mass scattering coefficients are discussed. At Fukue, the mass scattering coefficients under the ambient RH conditions were >1.5 times higher than those observed under the dry condition (RH = 40%), suggesting that the RH effect was crucial in determining optical properties under ambient conditions. The coefficients under the ambient RH conditions, rather than the dry values, agreed better with the extinction coefficients determined by MAX-DOAS (Multi-Axis Differential Optical Absorption Spectroscopy) technique based on remote measurements of O4 optical depths. The single-scattering albedo (SSA), estimated in combination to the absorption coefficients determined by a MAAP (Multi-Angle Absorption Photometer) instrument, had similar average values (~0.95) at the two sites. The SSA values at the two sites were commonly lowered (to below 0.90) when the air traveled from the North China Plain region. At Fukue, the RH dependence was found to be weakened when the organics/sulfate ratio increased (as observed by an Aerodyne Aerosol Mass Spectrometer), while such influence of chemical composition was less clear at Rudong, possibly masked by large temporal variations in the particle size distributions.

  4. One-step method for generating PEG-like plasma polymer gradients: chemical characterization and analysis of protein interactions.

    Science.gov (United States)

    Menzies, Donna J; Cowie, Bruce; Fong, Celesta; Forsythe, John S; Gengenbach, Thomas R; McLean, Keith M; Puskar, Ljiljana; Textor, Marcus; Thomsen, Lars; Tobin, Mark; Muir, Benjamin W

    2010-09-07

    In this work we report a one-step method for the fabrication of poly(ethylene glycol) PEG-like chemical gradients, which were deposited via continuous wave radio frequency glow discharge plasma polymerization of diethylene glycol dimethyl ether (DG). A knife edge top electrode was used to produce the gradient coatings at plasma load powers of 5 and 30 W. The chemistry across the gradients was analyzed using a number of complementary techniques including spatially resolved synchrotron source grazing incidence FTIR microspectroscopy, X-ray photoelectron spectroscopy (XPS) and synchrotron source near edge X-ray absorption fine structure (NEXAFS) spectroscopy. Gradients deposited at lower load power retained a higher degree of monomer like functionality as did the central region directly underneath the knife edge electrode of each gradient film. Surface derivatization experiments were employed to investigate the concentration of residual ether units in the films. In addition, surface derivatization was used to investigate the reactivity of the gradient films toward primary amine groups in a graft copolymer of poly (L-lysine) and poly(ethylene glycol) (PLL-g-PEG copolymer) which was correlated to residual aldehyde, ketone and carboxylic acid functionalities within the films. The protein adsorption characteristics of the gradients were analyzed using three proteins of varying size and charge. Protein adsorption varied and was dependent on the chemistry and the physical properties (such as size and charge) of the proteins. A correlation between the concentration of ether functionality and the protein fouling characteristics along the gradient films was observed. The gradient coating technique developed in this work allows for the efficient and high-throughput study of biomaterial gradient coating interactions.

  5. Shock tube experiments on nitromethane and Promotion of chemical reactions by non-thermal plasma

    Energy Technology Data Exchange (ETDEWEB)

    Seljeskog, Morten

    2002-06-01

    This dissertation was undertaken to study two different subjects both related to molecular decomposition by applying a shock tube and non-thermal plasma to decompose selected hydrocarbons. The first approach to molecular decomposition concerned thermal decomposition and oxidation of highly diluted nitromethane (NM) in a shock tube. Reflected shock tube experiments on NM decomposition, using mixtures of 0.2 to 1.5 vol% NM in nitrogen or argon were performed over the temperature range 850-1550 K and pressure range 190-900 kPa, with 46 experiments diluted in nitrogen and 44 diluted in argon. By residual error analysis of the measured decomposition profiles it was found that NM decomposition (CH{sub 3}NO{sub 2} + M {yields} CH{sub 3} + NO{sub 2} + M, where M = N{sub 2} /Ar) corresponds well to a law of first order. Arrhenius expressions corresponding to NM diluted either in N{sub 2} or in Ar were found as k{sub N2} = 10{sup 17.011} * exp(- 182.6 kJ/mole / R*T) and k{sub Ar} = 10{sup 17.574}*exp(-207 kJ/mole / R*T ) , respectively. A new reaction mechanism was then proposed, based on new experimental data for NM decomposition both in Ar and N{sub 2} and on three previously developed mechanisms. The new mechanism predicts well the decomposition of NM diluted in both N{sub 2} and Ar within the pressure and temperature range covered by the experiments. In parallel to, and following the decomposition experiments, oxidative experiments on the ignition delay times of NM/O{sub 2}/Ar mixtures were investigated over high temperature and low to high pressure ranges. These experiments were carried out with eight different mixtures of gaseous NM and oxygen diluted in argon, with pressures ranging between 44.3-600 kPa, and temperatures ranging between 842-1378 K. The oxidation experiments were divided into different categories according to the type of decomposition signals achieved. For signals with and without emission, the apparent quasi

  6. Shock tube experiments on nitromethane and Promotion of chemical reactions by non-thermal plasma

    Energy Technology Data Exchange (ETDEWEB)

    Seljeskog, Morten

    2002-06-01

    This dissertation was undertaken to study two different subjects both related to molecular decomposition by applying a shock tube and non-thermal plasma to decompose selected hydrocarbons. The first approach to molecular decomposition concerned thermal decomposition and oxidation of highly diluted nitromethane (NM) in a shock tube. Reflected shock tube experiments on NM decomposition, using mixtures of 0.2 to 1.5 vol% NM in nitrogen or argon were performed over the temperature range 850-1550 K and pressure range 190-900 kPa, with 46 experiments diluted in nitrogen and 44 diluted in argon. By residual error analysis of the measured decomposition profiles it was found that NM decomposition (CH{sub 3}NO{sub 2} + M {yields} CH{sub 3} + NO{sub 2} + M, where M = N{sub 2} /Ar) corresponds well to a law of first order. Arrhenius expressions corresponding to NM diluted either in N{sub 2} or in Ar were found as k{sub N2} = 10{sup 17.011} * exp(- 182.6 kJ/mole / R*T) and k{sub Ar} = 10{sup 17.574}*exp(-207 kJ/mole / R*T ) , respectively. A new reaction mechanism was then proposed, based on new experimental data for NM decomposition both in Ar and N{sub 2} and on three previously developed mechanisms. The new mechanism predicts well the decomposition of NM diluted in both N{sub 2} and Ar within the pressure and temperature range covered by the experiments. In parallel to, and following the decomposition experiments, oxidative experiments on the ignition delay times of NM/O{sub 2}/Ar mixtures were investigated over high temperature and low to high pressure ranges. These experiments were carried out with eight different mixtures of gaseous NM and oxygen diluted in argon, with pressures ranging between 44.3-600 kPa, and temperatures ranging between 842-1378 K. The oxidation experiments were divided into different categories according to the type of decomposition signals achieved. For signals with and without emission, the apparent quasi

  7. Comparison of hafnium silicate thin films on silicon (1 0 0) deposited using thermal and plasma enhanced metal organic chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Rangarajan, Vishwanathan; Bhandari, Harish; Klein, Tonya M

    2002-11-01

    Hafnium silicate thin films were deposited by metal organic chemical vapor deposition (MOCVD) on Si at 400 deg. C using hafnium (IV) t-butoxide. Films annealed in O{sub 2} were compared to as-deposited films using X-ray photoelectron spectroscopy and X-ray diffraction. Hafnium silicate films were deposited by both thermal and plasma enhanced MOCVD using 2% SiH{sub 4} in He as the Si precursor. An O{sub 2} plasma increased Si content to as much as {approx}26 at.% Si. Both thermal and plasma deposited Hf silicates are amorphous as deposited, however, thermal films exhibit crystallinity after anneal. Surface roughness as measured by atomic force microscopy was found to be 1.1 and 5.1 nm for MOCVD hafnium silicate and plasma enhanced MOCVD hafnium silicate, respectively.

  8. Low-temperature synthesis of diamond films by photoemission-assisted plasma-enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kawata, Mayuri, E-mail: kawata@mail.tagen.tohoku.ac.jp; Ojiro, Yoshihiro; Ogawa, Shuichi; Takakuwa, Yuji [Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan); Masuzawa, Tomoaki; Okano, Ken [International Christian University, 3-10-2 Osawa, Mitaka 181-8585 (Japan)

    2014-03-15

    Photoemission-assisted plasma-enhanced chemical vapor deposition (PA-PECVD), a process in which photoelectrons emitted from a substrate irradiated with ultraviolet light are utilized as a trigger for DC discharge, was investigated in this study; specifically, the DC discharge characteristics of PA-PECVD were examined for an Si substrate deposited in advance through hot-filament chemical vapor deposition with a nitrogen-doped diamond layer of thickness ∼1 μm. Using a commercially available Xe excimer lamp (hν = 7.2 eV) to illuminate the diamond surface with and without hydrogen termination, the photocurrents were found to be 3.17 × 10{sup 12} and 2.11 × 10{sup 11} electrons/cm{sup 2}/s, respectively. The 15-fold increase in photocurrent was ascribed to negative electron affinity (NEA) caused by hydrogen termination on the diamond surfaces. The DC discharge characteristics revealed that a transition bias voltage from a Townsend-to-glow discharge was considerably decreased because of NEA (from 490 to 373 V for H{sub 2} gas and from 330 to 200 V for Ar gas), enabling a reduction in electric power consumption needed to synthesize diamond films through PA-PECVD. In fact, the authors have succeeded in growing high-quality diamond films of area 2.0 cm{sup 2} at 540 °C with a discharge power of only 1.8 W, plasma voltage of 156.4 V, and discharge current of 11.7 mA under the glow discharge of CH{sub 4}/H{sub 2}/Ar mixed gases. In addition to having only negligible amounts of graphite and amorphous carbon, the diamond films exhibit a relatively high diamond growth rate of 0.5 μm/h at temperatures as low as 540 °C, which is attributed to Ar{sup +} ions impinging on the diamond surface, and causing the removal of hydrogen atoms from the surface through sputtering. This process leads to enhanced CH{sub x} radical adsorption, because the sample was applied with a negative potential to accelerate photoelectrons in PA-PECVD.

  9. Surface physical-morphological and chemical changes leading to performance enhancement of atmospheric pressure plasma treated polyester fabrics for inkjet printing

    Science.gov (United States)

    Fang, Kuanjun; Zhang, Chunming

    2009-06-01

    Without any preprocessing, polyester fabric has lower ability to hold on water due to the smooth morphology and chemistry property of polyester fibers. Therefore, patterns directly printed with pigment inks have poor color yields and easily bleed. In this paper, atmospheric pressure plasma was used to pretreat polyester fabric in order to provide an active surface for the inkjet printing. The results showed that surface-modified polyester fabrics could obtain the effects of features with enhanced color yields and excellent pattern sharpness. SEM images indicated that the rough surface of plasma treated fibers could provide more capacities for the fabric to capture inks and also facilitate the penetration of colorant particles into the polyester fabric. XPS analysis revealed that air + 50%Ar plasma introduced more oxygen-containing groups onto the fabric surface than air plasma. Although AFM images indicated that etching effects generated by air plasma treatments were more evident, the air/Ar plasma treated sample has higher K/ S value and better color performance. These studies have also shown that the chemical modification of plasma appears to be relatively more significant for improving the effect of inkjet printing.

  10. Sputtering yields and surface chemical modification of tin-doped indium oxide in hydrocarbon-based plasma etching

    Energy Technology Data Exchange (ETDEWEB)

    Li, Hu; Karahashi, Kazuhiro; Hamaguchi, Satoshi, E-mail: hamaguch@ppl.eng.osaka-u.ac.jp [Center for Atomic and Molecular Technologies, Osaka University, Yamadaoka 2-1, Suita 565-0871 (Japan); Fukasawa, Masanaga; Nagahata, Kazunori; Tatsumi, Tetsuya [Device and Material R& D Group, RDS Platform, Sony Corporation, Kanagawa 243-0014 (Japan)

    2015-11-15

    Sputtering yields and surface chemical compositions of tin-doped indium oxide (or indium tin oxide, ITO) by CH{sup +}, CH{sub 3}{sup +}, and inert-gas ion (He{sup +}, Ne{sup +}, and Ar{sup +}) incidence have been obtained experimentally with the use of a mass-selected ion beam system and in-situ x-ray photoelectron spectroscopy. It has been found that etching of ITO is chemically enhanced by energetic incidence of hydrocarbon (CH{sub x}{sup +}) ions. At high incident energy incidence, it appears that carbon of incident ions predominantly reduce indium (In) of ITO and the ITO sputtering yields by CH{sup +} and CH{sub 3}{sup +} ions are found to be essentially equal. At lower incident energy (less than 500 eV or so), however, a hydrogen effect on ITO reduction is more pronounced and the ITO surface is more reduced by CH{sub 3}{sup +} ions than CH{sup +} ions. Although the surface is covered more with metallic In by low-energy incident CH{sub 3}{sup +} ions than CH{sup +} ions and metallic In is in general less resistant against physical sputtering than its oxide, the ITO sputtering yield by incident CH{sub 3}{sup +} ions is found to be lower than that by incident CH{sup +} ions in this energy range. A postulation to account for the relation between the observed sputtering yield and reduction of the ITO surface is also presented. The results presented here offer a better understanding of elementary surface reactions observed in reactive ion etching processes of ITO by hydrocarbon plasmas.

  11. Chemical stability and osteogenic activity of plasma-sprayed boron-modified calcium silicate-based coatings.

    Science.gov (United States)

    Lu, Xiang; Li, Kai; Xie, Youtao; Huang, Liping; Zheng, Xuebin

    2016-11-01

    In recent years, CaSiO3 bio-ceramic coatings have attracted great attention because of their good bioactivity. However, their high degradation rates in physiological environment restrict their practical applications. In this work, boron-modified CaSiO3 ceramic (Ca11Si4B2O22, B-CS) coating was developed on Ti substrates by plasma-spraying technique attempting to obtain enhanced chemical stability and osteogenic activity. The B-CS coating possessed significantly increased chemical stability due to the introduction of boron and consequently the modified crystal structure, while maintaining good bioactivity. Scanning electron microscope and immunofluorescence studies showed that better cellular adhesion and extinctive filopodia-like processes were observed on the B-CS coating. Compared with the pure CaSiO3 (CS) coating, the B-CS coating promoted MC3T3-E1 cells attachment and proliferation. In addition, enhanced collagen I (COL-I) secretion, alkaline phosphatase activity, and extracellular matrix mineralization levels were detected from the B-CS coating. According to RT-PCR results, notable up-regulation expressions of mineralized tissue-related genes, such as runt-related transcription factor 2 (Runx2), bone sialoprotein and osteocalcin, and bone morphogenetic protein 7 (BMP-7) were observed on the B-CS coating compared with the CS coating. The above results suggested that Ca11Si4B2O22 coatings possess excellent osteogenic activity and might be a promising candidate for orthopedic applications.

  12. Alkali Absorption Property of Polypropylene Non-woven Fabrics Surface Modified by Hollow Cathode Remote Plasma Polymerization%空心阴极远区等离子体接枝聚合表面改性丙纶无纺布的吸碱性能

    Institute of Scientific and Technical Information of China (English)

    温贻芳; 陈新; 王士喜; 芮延年; 王红卫

    2011-01-01

    利用空心阴极远区等离子体改性技术对丙纶无纺布表面进行了改性处理,研究了等离子体处理参数对丙纶无纺布吸碱性能的影响;采用红外光谱、扫描电镜等对丙纶无纺布表面的化学组成和形态等进行了表征。结果表明:等离子体处理时间、放电功率、气体流量等对丙纶无纺布的吸碱性能有很大的影响,而且试样距丙烯酸喂气管的距离对处理效果的影响也很明显;通过空心阴极远区等离子体接枝聚合表面改性处理,在丙纶无纺布的表面引入了亲水性羧基基团,改善了其浸润性,显著提高了其吸碱率和吸碱速率,达到了国外进1:7电池隔膜的指标。%The surface of polypropylene non-woven fabrics was modified by hollow cathode remote plasma modification technology. The effect of the plasma treatment parameters on the property of polypropylene non-woven fabrics was studied. The FTIR and SEM were used to analyze the chemical composition and morphology. The results show that plasma treatment time, discharge power, gas flow had a great influence on the alkali absorption property, and the effect of the distance between the sample and acrylic acid feeding tube on treatment results was obvious. The invasion property of the polypropylene non-woven fabrics was improved due to the import of hydrophilic group by hollow cathode remote plasma surface modification. The alkali absorption capacity and rate were raised obviously, and the alkali absorption performance reached the level of foreign battery separator.

  13. Deposition and characterization of diamond-like nanocomposite coatings grown by plasma enhanced chemical vapour deposition over different substrate materials

    Indian Academy of Sciences (India)

    Awadesh Kr Mallik; Nanadadulal Dandapat; Prajit Ghosh; Utpal Ganguly; Sukhendu Jana; Sayan Das; Kaustav Guha; Garfield Rebello; Samir Kumar Lahiri; Someswar Datta

    2013-04-01

    Diamond-like nanocomposite (DLN) coatings have been deposited over different substrates used for biomedical applications by plasma-enhanced chemical vapour deposition (PECVD). DLN has an interconnecting network of amorphous hydrogenated carbon and quartz-like oxygenated silicon. Raman spectroscopy, Fourier transform–infra red (FT–IR) spectroscopy, transmission electron microscopy (TEM) and X-ray diffraction (XRD) have been used for structural characterization. Typical DLN growth rate is about 1 m/h, measured by stylus profilometer. Due to the presence of quartz-like Si:O in the structure, it is found to have very good adhesive property with all the substrates. The adhesion strength found to be as high as 0.6 N on SS 316 L steel substrates by scratch testing method. The Young’s modulus and hardness have found to be 132 GPa and 14.4 GPa, respectively. DLN coatings have wear factor in the order of 1 × 10-7 mm3/N-m. This coating has found to be compatible with all important biomedical substrate materials and has successfully been deposited over Co–Cr alloy based knee implant of complex shape.

  14. Tribological and thermal stability study of nanoporous amorphous boron carbide films prepared by pulsed plasma chemical vapor deposition

    Science.gov (United States)

    Liza, Shahira; Ohtake, Naoto; Akasaka, Hiroki; Munoz-Guijosa, Juan M.

    2015-06-01

    In this work, the thermal stability and the oxidation and tribological behavior of nanoporous a-BC:H films are studied and compared with those in conventional diamond-like carbon (DLC) films. a-BC:H films were deposited by pulsed plasma chemical vapor deposition using B(CH3)3 gas as the boron source. A DLC interlayer was used to prevent the a-BC:H film delamination produced by oxidation. Thermal stability of a-BC:H films, with no delamination signs after annealing at 500 °C for 1 h, is better than that of the DLC films, which completely disappeared under the same conditions. Tribological test results indicate that the a-BC:H films, even with lower nanoindentation hardness than the DLC films, show an excellent boundary oil lubricated behavior, with lower friction coefficient and reduce the wear rate of counter materials than those on the DLC film. The good materials properties such as low modulus of elasticity and the formation of micropores from the original nanopores during boundary regimes explain this better performance. Results show that porous a-BC:H films may be an alternative for segmented DLC films in applications where severe tribological conditions and complex shapes exist, so surface patterning is unfeasible.

  15. Bamboo and herringbone shaped carbon nanotubes and carbon nanofibres synthesized in direct current-plasma enhanced chemical vapour deposition.

    Science.gov (United States)

    Zhang, Lu; Chen, Li; Wells, Torquil; El-Gomati, Mohamed

    2009-07-01

    Carbon nanotubes with different structures were catalytically synthesized on Ni coated SiO2/Si substrate in a Direct Current Plasma Enhanced Chemical Vapour Deposition system, in which C2H2 acted as the carbon source and NH3 as the etchant gas. A Scanning Electron Microscope study showed that carbon nanotubes were all vertically aligned with respect to the substrate, with diameters ranging from 10 nm to 200 nm. Different sizes of Ni catalyst particles were observed on the tips of carbon nanotubes. Transmission Electron Microscopy was used to study the morphology of the grown tubes and the results obtained show that the diameters and structures of these carbon nanotubes were closely correlated to the sizes and structures of the Ni nanoparticles. Two main structures namely bamboo shaped carbon nanotubes and herringbone shaped carbon nanofibres were found on the same sample. It is suggested that by controlling the pre-growth condition, desired structure of carbon nanotubes or carbon nanofibres could be produced for practical applications.

  16. Plasma-enhanced chemical vapor deposition of low-loss SiON optical waveguides at 15-microm wavelength.

    Science.gov (United States)

    Bruno, F; Guidice, M D; Recca, R; Testa, F

    1991-11-01

    Good optical-quality SiON layers deposited upon a SiO(2) buffer layer placed upon silicon wafers have been obtained by using plasma-enhanced chemical vapor deposition from SiH(4), NH(3), and N(2)O. Optical planar waveguides with a thickness of 5 microm and a refractive index of 1.470 have been deposited and investigated in the wavelength region of 1.3-1.6 microm. Three absorption bands at 1.40, 1.48, and 1.54 microm have been detected and interpreted as Si-OH, N-H, and Si-H vibrational modes, respectively. Absorption losses of 3.8 dB/cm at 1.4 microm and 3.2 dB/cm at 1.51 microm have been measured. A mild annealing at approximately 800 degrees C completely removes the band at 1.40 microm, whereas strong reduction of absorption at 1.51 microm requires 3 h of annealing at 1100 degrees C. As a result, propagation losses of 0.36 to 0.54 dB/cm have been measured at 1.54-microm wavelength.

  17. Osteoconductive Potential of Barrier NanoSiO2 PLGA Membranes Functionalized by Plasma Enhanced Chemical Vapour Deposition

    Directory of Open Access Journals (Sweden)

    Antonia Terriza

    2014-01-01

    Full Text Available The possibility of tailoring membrane surfaces with osteoconductive potential, in particular in biodegradable devices, to create modified biomaterials that stimulate osteoblast response should make them more suitable for clinical use, hopefully enhancing bone regeneration. Bioactive inorganic materials, such as silica, have been suggested to improve the bioactivity of synthetic biopolymers. An in vitro study on HOB human osteoblasts was performed to assess biocompatibility and bioactivity of SiO2 functionalized poly(lactide-co-glycolide (PLGA membranes, prior to clinical use. A 15 nm SiO2 layer was deposited by plasma enhanced chemical vapour deposition (PECVD, onto a resorbable PLGA membrane. Samples were characterized by X-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, and infrared spectroscopy (FT-IR. HOB cells were seeded on sterilized test surfaces where cell morphology, spreading, actin cytoskeletal organization, and focal adhesion expression were assessed. As proved by the FT-IR analysis of samples, the deposition by PECVD of the SiO2 onto the PLGA membrane did not alter the composition and other characteristics of the organic membrane. A temporal and spatial reorganization of cytoskeleton and focal adhesions and morphological changes in response to SiO2 nanolayer were identified in our model. The novedous SiO2 deposition method is compatible with the standard sterilization protocols and reveals as a valuable tool to increase bioactivity of resorbable PLGA membranes.

  18. Simple fabrication of hydrophilic nanochannels using the chemical bonding between activated ultrathin PDMS layer and cover glass by oxygen plasma.

    Science.gov (United States)

    Kim, So Hyun; Cui, Yidan; Lee, Min Jung; Nam, Seong-Won; Oh, Doori; Kang, Seong Ho; Kim, Youn Sang; Park, Sungsu

    2011-01-21

    This study describes a simple and low cost method for fabricating enclosed transparent hydrophilic nanochannels by coating low-viscosity PDMS (monoglycidyl ether-terminated polydimethylsiloxane) as an adhesion layer onto the surface of the nanotrenches that are molded with a urethane-based UV-curable polymer, Norland Optical Adhesive (NOA 63). In detail, the nanotrenches made of NOA 63 were replicated from a Si master mold and coated with 6 nm thick layer of PDMS. These nanotrenches underwent an oxygen plasma treatment and finally were bound to a cover glass by chemical bonding between silanol and hydroxyl groups. Hydrophobic recovery that is observed in the bulk PDMS was not observed in the thin film of PDMS on the mold and the PDMS-coated nanochannel maintained its surface hydrophilicity for at least one month. The potentials of the nanochannels for bioapplications were demonstrated by stretching λ-DNA (48,502 bp) in the channels. Therefore, this fabrication approach provides a practical solution for the simple fabrication of the nanochannels for bioapplications.

  19. A new perspective on structural and morphological properties of carbon nanotubes synthesized by Plasma Enhanced Chemical Vapor Deposition technique

    Science.gov (United States)

    Salar Elahi, A.; Agah, K. Mikaili; Ghoranneviss, M.

    CNTs were produced on a silicon wafer by Plasma Enhanced Chemical Vapor Deposition (PECVD) using acetylene as a carbon source, cobalt as a catalyst and ammonia as a reactive gas. The DC-sputtering system was used to prepare cobalt thin films on Si substrates. A series of experiments was carried out to investigate the effects of reaction temperature and deposition time on the synthesis of the nanotubes. The deposition time was selected as 15 and 25 min for all growth temperatures. Energy Dispersive X-ray (EDX) measurements were used to investigate the elemental composition of the Co nanocatalyst deposited on Si substrates. Atomic Force Microscopy (AFM) was used to characterize the surface topography of the Co nanocatalyst deposited on Si substrates. The as-grown CNTs were characterized under Field Emission Scanning Electron Microscopy (FESEM) to study the morphological properties of CNTs. Also, the grown CNTs have been investigated by High Resolution Transmission Electron Microscopy (HRTEM) and Raman spectroscopy. The results demonstrated that increasing the temperature leads to increasing the diameter of CNTs.

  20. Osteoconductive Potential of Barrier NanoSiO2 PLGA Membranes Functionalized by Plasma Enhanced Chemical Vapour Deposition

    Science.gov (United States)

    Terriza, Antonia; Vilches-Pérez, Jose I.; de la Orden, Emilio; Yubero, Francisco; Gonzalez-Caballero, Juan L.; González-Elipe, Agustin R.; Vilches, José; Salido, Mercedes

    2014-01-01

    The possibility of tailoring membrane surfaces with osteoconductive potential, in particular in biodegradable devices, to create modified biomaterials that stimulate osteoblast response should make them more suitable for clinical use, hopefully enhancing bone regeneration. Bioactive inorganic materials, such as silica, have been suggested to improve the bioactivity of synthetic biopolymers. An in vitro study on HOB human osteoblasts was performed to assess biocompatibility and bioactivity of SiO2 functionalized poly(lactide-co-glycolide) (PLGA) membranes, prior to clinical use. A 15 nm SiO2 layer was deposited by plasma enhanced chemical vapour deposition (PECVD), onto a resorbable PLGA membrane. Samples were characterized by X-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, and infrared spectroscopy (FT-IR). HOB cells were seeded on sterilized test surfaces where cell morphology, spreading, actin cytoskeletal organization, and focal adhesion expression were assessed. As proved by the FT-IR analysis of samples, the deposition by PECVD of the SiO2 onto the PLGA membrane did not alter the composition and other characteristics of the organic membrane. A temporal and spatial reorganization of cytoskeleton and focal adhesions and morphological changes in response to SiO2 nanolayer were identified in our model. The novedous SiO2 deposition method is compatible with the standard sterilization protocols and reveals as a valuable tool to increase bioactivity of resorbable PLGA membranes. PMID:24883304

  1. Plasma-enhanced Chemical Vapordeposition SiO2 Film after Ion Implantation Induces Quantum Well Intermixing

    Institute of Scientific and Technical Information of China (English)

    PENG Jucun; WU Boying; CHEN Jie; ZHAO Jie; WANG Yongchen

    2006-01-01

    A method of QWI ( quantum well intermixing) realizing through plasma-enhanced chemical vapordepositiom (PECVD) SiO2 film following ion implantation was investigated. PECVD 200 nm SiO2 film after 160 keV phosphorus(P) ion implantation was performed to induce InP-based multiple-quantum-well (MQW) laser structural intermixing, annealing process was carried out at 780 ℃ for 30 seconds under N2 flue, the blue shift ofphotoluminescence (PL) peak related to implanted dose: 1 × 1011 , 1 × 1012, 1 × 1013 ,3 × 1013 , 7 × 1013 ion/ cm2 is 22 nm, 65 nm, 104 nm, 109 nm, 101 nm, respectively. Under the same conditions, by comparing the blue shift of PL peak with P ion implantation only, slight differentiation between the two methods was observed, and results reveal that the defects in the implanting layers generated by ion implantation are much more than those in SiO2 film. So, the blue shift results mainly from ion implantation. However , SiO2 film also may promote the quantum well intermixing.

  2. Morphology and Structure Properties of Boron-doped Diamond Films Prepared by Hot Cathode Direct Current Plasma Chemical Vapor Deposition

    Directory of Open Access Journals (Sweden)

    Mengmei PAN

    2016-05-01

    Full Text Available Boron-doped diamond (BDD films were deposited by hot cathode direct current plasma chemical vapor deposition (HCDC-PCVD according to various mixture ratios of CH4/H2/B(OCH33 gas. The Raman performances and surface morphologies of the BDD films were then characterized by Raman spectroscopy and scanning electron microscopy (SEM. Results indicated that the flow rate of B(OCH33 had marked effects on the growth characteristics of the produced boron-doped diamond films. The presence and concentration of the doped boron atoms significantly altered both the surface morphologies and structures of the diamond films. With increasing flow rate of B(OCH33, the crystal grain surfaces became smooth as visible under SEM. The B-doping levels in these films increased from 1.75×1019cm-3 to a maximum of 2.4×1021cm-3, estimated from the Raman spectra. DOI: http://dx.doi.org/10.5755/j01.ms.22.2.12923

  3. Optical spectroscopic analyses of CVD plasmas used in the deposition of transparent and conductive ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Martin, A.; Espinos, J.P.; Yubero, F.; Barranco, A.; Gonzalez-Elipe, A.R. [Instituto de Ciencias de Materiales de Sevilla, CSIC-Universidad de Sevilla (Spain); Cotrino, J. [Universidad de Sevilla, Facultad de Fisica, Dept. de Fisica Atomica, Molecular y Nuclear, Sevilla (Spain)

    2001-07-01

    Transparent conducting ZnO:A1 thin films have been prepared by remote plasma enhanced chemical vapor deposition. Emission line profiles were recorded as a function of different plasma gas composition (oxygen and hydrogen mixtures) and different rates of precursors (Zn(C{sub 2}H{sub 5}){sub 2} and A1(CH{sub 3}){sub 3}) in the downstream zone of the plasma reactor. Optical emission spectroscopy were used to characterize the oxygen/hydrogen plasma as a function of hydrogen flow rate. The variation of plasma hydrogen content has an important influence in the resistivity of the films. (authors)

  4. A New Type of Multielements-Doped, Carbon-based Materials Characterized by High-thermoconductiv ity, Low Chemical Sputtering, Low RES Yield and Exposure to Plasma

    Institute of Scientific and Technical Information of China (English)

    许增裕; 刘翔; 谌继明; 王明旭; 宋进仁; 翟更太; 李承新

    2002-01-01

    Low-Z materials, such as carbon-based materials and Be, are major plasma-facing material (PFM) for current, even in future fusion devices. In this paper, a new type of multielement-doped carbon-based materials developed are presented along with experimental re sults of their properties. The results indicate a decrease in chemical sputtering yield by one order of magnitude, a decrease in both thermal shock resistance and radiation-enhanced sublimation, an evidently lower temperature desorption spectrum, and combined properties of exposing to plasma.

  5. A New Type of Multielements—Dpoed.Carbon—based Materials Characterized by High—Thermoconductivity,Low Chemical Syputtering.Low RES Yield and Exposure to Plasma

    Institute of Scientific and Technical Information of China (English)

    许增裕; 宋进仁; 等

    2002-01-01

    Low-Z materials,such as carbon-based materials and Be,are major plasma-facing material (PFM) for current,even in future fusion devices.In this paper,new type of multielement-doped carbon-based materials developed are presented along with experimental results of their properties,The results indicate a decrease in chemical sputtering yield by one order of magnitude.a decrease in both thermal shock resistance and radiation-enhanced sublimation,an evidently lower temperature desorption spectrum ,and combined properties of exposing to plasma.

  6. Sub-micro a-C:H patterning of silicon surfaces assisted by atmospheric-pressure plasma-enhanced chemical vapor deposition

    Science.gov (United States)

    Boileau, Alexis; Gries, Thomas; Noël, Cédric; Perito Cardoso, Rodrigo; Belmonte, Thierry

    2016-11-01

    Micro and nano-patterning of surfaces is an increasingly popular challenge in the field of the miniaturization of devices assembled via top-down approaches. This study demonstrates the possibility of depositing sub-micrometric localized coatings—spots, lines or even more complex shapes—made of amorphous hydrogenated carbon (a-C:H) thanks to a moving XY stage. Deposition was performed on silicon substrates using chemical vapor deposition assisted by an argon atmospheric-pressure plasma jet. Acetylene was injected into the post-discharge region as a precursor by means of a glass capillary with a sub-micrometric diameter. A parametric study was carried out to study the influence of the geometric configurations (capillary diameter and capillary-plasma distance) on the deposited coating. Thus, the patterns formed were investigated by scanning electron microscopy and atomic force microscopy. Furthermore, the chemical composition of large coated areas was investigated by Fourier transform infrared spectroscopy according to the chosen atmospheric environment. The observed chemical bonds show that reactions of the gaseous precursor in the discharge region and both chemical and morphological stability of the patterns after treatment are strongly dependent on the surrounding gas. Various sub-micrometric a-C:H shapes were successfully deposited under controlled atmospheric conditions using argon as inerting gas. Overall, this new process of micro-scale additive manufacturing by atmospheric plasma offers unusually high-resolution at low cost.

  7. Chemical and microstructural characterizations of plasma polymer films by time-of-flight secondary ion mass spectrometry and principal component analysis

    Energy Technology Data Exchange (ETDEWEB)

    Cossement, Damien, E-mail: damien.cossement@materianova.be [Materia Nova Research Center, Parc Initialis, 1, Avenue Nicolas Copernic, B-7000 Mons (Belgium); Renaux, Fabian [Materia Nova Research Center, Parc Initialis, 1, Avenue Nicolas Copernic, B-7000 Mons (Belgium); Thiry, Damien; Ligot, Sylvie [Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, B-7000 Mons (Belgium); Francq, Rémy; Snyders, Rony [Materia Nova Research Center, Parc Initialis, 1, Avenue Nicolas Copernic, B-7000 Mons (Belgium); Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, B-7000 Mons (Belgium)

    2015-11-15

    Graphical abstract: - Highlights: • Plasma polymer films have a chemical selectivity and a cross-linking degree which are known to vary in opposite trends. • Three plasma polymers families were used as model organic layers for cross-linking evaluation by ToF-SIMS and principal component analysis. • The data were cross-checked with related functional properties that are known to depend on the cross-linking degree (stability in solvent, mechanical properties, …). • The suggested cross-linking evaluation method was validated for different families of plasma polymers demonstrating that it can be seen as a “general” method. - Abstract: It is accepted that the macroscopic properties of functional plasma polymer films (PPF) are defined by their functional density and their crosslinking degree (χ) which are quantities that most of the time behave in opposite trends. If the PPF chemistry is relatively easy to evaluate, it is much more challenging for χ. This paper reviews the recent work developed in our group on the application of principal component analysis (PCA) to time-of-flight secondary ion mass spectrometric (ToF-SIMS) positive spectra data in order to extract the relative cross-linking degree (χ) of PPF. NH{sub 2}-, COOR- and SH-containing PPF synthesized in our group by plasma enhanced chemical vapor deposition (PECVD) varying the applied radiofrequency power (P{sub RF}), have been used as model surfaces. For the three plasma polymer families, the scores of the first computed principal component (PC1) highlighted significant differences in the chemical composition supported by X-Ray photoelectron spectroscopy (XPS) data. The most important fragments contributing to PC1 (loadings > 90%) were used to compute an average C/H ratio index for samples synthesized at low and high P{sub RF}. This ratio being an evaluation of χ, these data, accordingly to the literature, indicates an increase of χ with P{sub RF} excepted for the SH-PPF. These results have

  8. Remote Sensing.

    Science.gov (United States)

    Williams, Richard S., Jr.; Southworth, C. Scott

    1983-01-01

    The Landsat Program became the major event of 1982 in geological remote sensing with the successful launch of Landsat 4. Other 1982 remote sensing accomplishments, research, publications, (including a set of Landsat worldwide reference system index maps), and conferences are highlighted. (JN)

  9. Remote medicine

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1996-04-29

    The international oil industry, catalyzed by a surge in exploration and production projects in remote regions, is giving health care for its travelers and expatriates a high priority. L.R. Aalund, the Journal`s Managing Editor--Technology, reports on why and how this is happening now. He covers this in articles on: health care in Russia, air ambulance evacuations, and the deployment of remote paramedics. Aalund gathered the information during trips to Finland and Russia and interviews with oil industry personnel, physicians, and other medical professionals in North America, Europe, and Siberia. Titles of the four topics presented in this special section on remote medicine are as follows: Oil companies focus on emergency care for expats in Russia; Air ambulance plan can be critical; Remote paramedics have high level of training; and Other facets of remote medicine.

  10. Untargeted metabolomics reveals a mild impact of remote ischemic conditioning on the plasma metabolome and α-hydroxybutyrate as a possible cardioprotective factor and biomarker of tissue ischemia

    DEFF Research Database (Denmark)

    Laursen, Mia Roest; Hansen, Jakob; Elkjær, Casper

    2017-01-01

    metabolites were identified using univariate and multivariate statistical analysis. Results were finally verified in a second plasma study from the same group of volunteers and by testing a metabolite ester in the HL-1 cell model. RESULTS: The analysis revealed a moderate impact on the plasma metabolome...

  11. Chemical Characterisation of Bulk and Melt-spun Ribbons of NiMnIn Alloy using Inductively Coupled Plasma Optical Emission Spectrometry

    Directory of Open Access Journals (Sweden)

    S.S. Kalyan Kamal

    2011-05-01

    Full Text Available Method development for the analysis of NiMnIn, a new magnetocaloric effect (MCE material using inductively-coupled plasma optical emission spectrometry (ICPOES is discussed. Spectral interference of Ni and Mn on the analysis of In were studied. The process of method validation was carried out using various analytical techniques like conventional wet chemical techniques and instrumental techniques such as atomic absorption spectrometry. All the techniques show a close agreement in values, thus this method could be applied for regular analysis of NiMnIn alloys. A comparative chemical analysis of bulk and melt-spun ribbons of this alloy is also discussed.

  12. Determination of metformin in mouse, rat, dog and human plasma samples by laser diode thermal desorption/atmospheric pressure chemical ionization tandem mass spectrometry.

    Science.gov (United States)

    Swales, John G; Gallagher, Richard; Peter, Raimund M

    2010-11-02

    A simple, rapid and robust high-throughput assay for the quantitative analysis of metformin in plasma from different species using laser diode thermal desorption interfaced with atmospheric chemical pressure ionization tandem mass spectrometry (LDTD-APCI-MSMS) was developed for use in a pharmaceutical discovery environment. In order to minimize sample preparation a generic protein precipitation method was used to extract metformin from the plasma. Laser diode thermal desorption is a relatively new sample introduction method, the optimization of the instrumental parameters are presented. The method was successfully applied to spiked mouse, rat, dog and human plasma samples and was subsequently used to determine the oral pharmacokinetics of metformin after dosing to male rats in order to support drug discovery projects. The deviations for intra-assay accuracy and precision across the four species were less than 30% at all calibration and quality control levels.

  13. Growth and characterization of large, high quality single crystal diamond substrates via microwave plasma assisted chemical vapor deposition

    Science.gov (United States)

    Nad, Shreya

    Single crystal diamond (SCD) substrates can be utilized in a wide range of applications. Important issues in the chemical vapor deposition (CVD) of such substrates include: shrinking of the SCD substrate area, stress and cracking, high defect density and hence low electronic quality and low optical quality due to high nitrogen impurities. The primary objective of this thesis is to begin to address these issues and to find possible solutions for enhancing the substrate dimensions and simultaneously improving the quality of the grown substrates. The deposition of SCD substrates is carried out in a microwave cavity plasma reactor via the microwave plasma assisted chemical vapor deposition technique. The operation of the reactor was first optimized to determine the safe and efficient operating regime. By adjusting the matching of the reactor cavity with the help of four internal tuning length variables, the system was further matched to operate at a maximum overall microwave coupling efficiency of ˜ 98%. Even with adjustments in the substrate holder position, the reactor remains well matched with a coupling efficiency of ˜ 95% indicating good experimental performance over a wide range of operating conditions. SCD substrates were synthesized at a high pressure of 240 Torr and with a high absorbed power density of 500 W/cm3. To counter the issue of shrinking substrate size during growth, the effect of different substrate holder designs was studied. An increase in the substrate dimensions (1.23 -- 2.5 times) after growth was achieved when the sides of the seeds were shielded from the intense microwave electromagnetic fields in a pocket holder design. Using such pocket holders, high growth rates of 16 -- 32 mum/hr were obtained for growth times of 8 -- 72 hours. The polycrystalline diamond rim deposition was minimized/eliminated from these growth runs, hence successfully enlarging the substrate size. Several synthesized CVD SCD substrates were laser cut and separated

  14. [The determination of the natural content of chemical elements in human biological objects (liver, kidney, stomach) by mass spectrometry with inductively coupled plasma].

    Science.gov (United States)

    Luzanova, I S; Svetlolobov, D Iu; Zorin, Iu V

    2014-01-01

    The objective of the present work was to continue the studies of the sites of concentration of the chemical elements corresponding to normal homeostasis in human biological objects by mass spectrometry with inductively coupled plasma. The study yielded the data on the natural content of 27 elements in the cadaveric liver, kidney, and stomach. It is recommended to use these findings as the reference parameters corresponding to normal homeostasis.

  15. Chemical and microstructural characterizations of plasma polymer films by time-of-flight secondary ion mass spectrometry and principal component analysis

    Science.gov (United States)

    Cossement, Damien; Renaux, Fabian; Thiry, Damien; Ligot, Sylvie; Francq, Rémy; Snyders, Rony

    2015-11-01

    It is accepted that the macroscopic properties of functional plasma polymer films (PPF) are defined by their functional density and their crosslinking degree (χ) which are quantities that most of the time behave in opposite trends. If the PPF chemistry is relatively easy to evaluate, it is much more challenging for χ. This paper reviews the recent work developed in our group on the application of principal component analysis (PCA) to time-of-flight secondary ion mass spectrometric (ToF-SIMS) positive spectra data in order to extract the relative cross-linking degree (χ) of PPF. NH2-, COOR- and SH-containing PPF synthesized in our group by plasma enhanced chemical vapor deposition (PECVD) varying the applied radiofrequency power (PRF), have been used as model surfaces. For the three plasma polymer families, the scores of the first computed principal component (PC1) highlighted significant differences in the chemical composition supported by X-Ray photoelectron spectroscopy (XPS) data. The most important fragments contributing to PC1 (loadings > 90%) were used to compute an average C/H ratio index for samples synthesized at low and high PRF. This ratio being an evaluation of χ, these data, accordingly to the literature, indicates an increase of χ with PRF excepted for the SH-PPF. These results have been cross-checked by the evaluation of functional properties of the plasma polymers namely a linear correlation with the stability of NH2-PPF in ethanol and a correlation with the mechanical properties of the COOR-PPF. For the SH-PPF family, the peculiar evolution of χ is supported by the understanding of the growth mechanism of the PPF from plasma diagnostic. The whole set of data clearly demonstrates the potential of the PCA method for extracting information on the microstructure of plasma polymers from ToF-SIMS measurements.

  16. Atmospheric pressure plasma chemical vapor deposition reactor for 100 mm wafers, optimized for minimum contamination at low gas flow rates

    Energy Technology Data Exchange (ETDEWEB)

    Anand, Venu, E-mail: venuanand@cense.iisc.ernet.in, E-mail: venuanand83@gmail.com; Shivashankar, S. A. [Centre for Nano Science and Engineering (CeNSE), Indian Institute of Science (IISc), Bangalore 560012 (India); Nair, Aswathi R.; Mohan Rao, G. [Department of Instrumentation and Applied Physics (IAP), Indian Institute of Science (IISc), Bangalore 560012 (India)

    2015-08-31

    Gas discharge plasmas used for thinfilm deposition by plasma-enhanced chemical vapor deposition (PECVD) must be devoid of contaminants, like dust or active species which disturb the intended chemical reaction. In atmospheric pressure plasma systems employing an inert gas, the main source of such contamination is the residual air inside the system. To enable the construction of an atmospheric pressure plasma (APP) system with minimal contamination, we have carried out fluid dynamic simulation of the APP chamber into which an inert gas is injected at different mass flow rates. On the basis of the simulation results, we have designed and built a simple, scaled APP system, which is capable of holding a 100 mm substrate wafer, so that the presence of air (contamination) in the APP chamber is minimized with as low a flow rate of argon as possible. This is examined systematically by examining optical emission from the plasma as a function of inert gas flow rate. It is found that optical emission from the plasma shows the presence of atmospheric air, if the inlet argon flow rate is lowered below 300 sccm. That there is minimal contamination of the APP reactor built here, was verified by conducting an atmospheric pressure PECVD process under acetylene flow, combined with argon flow at 100 sccm and 500 sccm. The deposition of a polymer coating is confirmed by infrared spectroscopy. X-ray photoelectron spectroscopy shows that the polymer coating contains only 5% of oxygen, which is comparable to the oxygen content in polymer deposits obtained in low-pressure PECVD systems.

  17. Plasma-chemical reactor based on a low-pressure pulsed arc discharge for synthesis of nanopowders

    Science.gov (United States)

    Karpov, I. V.; Ushakov, A. V.; Lepeshev, A. A.; Fedorov, L. Yu.

    2017-01-01

    A reactor for producing nanopowders in the plasma of a low-pressure arc discharge has been developed. As a plasma source, a pulsed cold-cathode arc evaporator has been applied. The design and operating principle of the reactor have been described. Experimental data on how the movement of a gaseous mixture in the reactor influences the properties of nanopowders have been presented.

  18. CHARACTERISTICS OF A FAST RISE TIME POWER SUPPLY FOR A PULSED PLASMA REACTOR FOR CHEMICAL VAPOR DESTRUCTION

    Science.gov (United States)

    Rotating spark gap devices for switching high-voltage direct current (dc) into a corona plasma reactor can achieve pulse rise times in the range of tens of nanoseconds. The fast rise times lead to vigorous plasma generation without sparking at instantaneous applied voltages highe...

  19. Inactivation of chemical and heat-resistant spores of Bacillus and Geobacillus by nitrogen cold atmospheric plasma and comparison to thermal and chemical based methods

    NARCIS (Netherlands)

    Bokhorst-van de Veen, van H.; Xie, H.; Esveld, D.C.; Abee, T.; Mastwijk, H.C.; Nierop Groot, M.N.

    2015-01-01

    Bacterial spores are resistant to severe conditions and form a challenge to eradicate from food or food packaging material. Cold atmospheric plasma (CAP) treatment is receiving more attention as potential sterilization method at relatively mild conditions but the exact mechanism of inactivation is s

  20. Inactivation of chemical and heat-resistant spores of Bacillus and Geobacillus by nitrogen cold atmospheric plasma and comparison to thermal and chemical based methods

    NARCIS (Netherlands)

    Bokhorst-van de Veen, van H.; Xie, H.; Esveld, D.C.; Abee, T.; Mastwijk, H.C.; Nierop Groot, M.N.

    2015-01-01

    Bacterial spores are resistant to severe conditions and form a challenge to eradicate from food or food packaging material. Cold atmospheric plasma (CAP) treatment is receiving more attention as potential sterilization method at relatively mild conditions but the exact mechanism of inactivation is

  1. Spectroscopic study of low pressure, low temperature H2-CH4-CO2 microwave plasmas used for large area deposition of nanocrystalline diamond films. Part II: on plasma chemical processes

    Science.gov (United States)

    Nave, A. S. C.; Baudrillart, B.; Hamann, S.; Bénédic, F.; Lombardi, G.; Gicquel, A.; van Helden, J. H.; Röpcke, J.

    2016-12-01

    In a distributed antenna array (DAA) reactor, microwave H2 plasmas with admixtures of 2.5% CH4 and 1% CO2 used for the deposition of nanocrystalline diamond films have been studied by infrared laser absorption and optical emission spectroscopy (OES) techniques. The experiments were carried out in order to analyze the dependence of plasma chemical phenomena on power and pressure at relatively low pressures, up to 0.55 mbar, and power values, up to 3 kW. The evolution of the concentration of the methyl radical, CH3, of five stable molecules, CH4, CO2, CO, C2H2 and C2H6, and of vibrationally excited CO in the first and second hot band was monitored in the plasma processes by in situ infrared laser absorption spectroscopy using tunable lead salt diode lasers (TDL) and an external-cavity quantum cascade laser (EC-QCL) as radiation sources. OES was applied simultaneously to obtain complementary information about the degree of dissociation of the H2 precursor and of its gas temperature. The experimental results are presented in two separate parts. In Part I, the first paper in a two-part series, the measurement of the gas (T gas), rotational (T rot) and vibrational (T vib) temperatures of the various species in the complex plasma was the main focus of interest. Depending on the different plasma zones the gas temperature was found to range between about 360 and 1000 K inside the DAA reactor (Nave et al 2016 Plasma Sources Sci. Technol. 25 065002). In Part II, the present paper, taking into account the temperatures determined in the first paper, the concentrations of the various species, which were found to be in a range between 1011 and 1015 cm-3, are the focus of interest. The influence of the discharge parameters power and pressure on the molecular concentrations has been studied. To achieve further insight into general plasma chemical aspects the dissociation of the carbon precursor gases including their fragmentation and conversion to the reaction products has been

  2. Inactivation of Gram-Negative Bacteria by Low-Pressure RF Remote Plasma Excited in N2-O2 Mixture and SF6 Gases

    Directory of Open Access Journals (Sweden)

    Ayman Al-Mariri

    2013-12-01

    Full Text Available The role of low-pressure RF plasma in the inactivation of Escherichia coli O157, Klebsiella pneumoniae, Proteus mirabilis, and Enterobacter sakazakii using N2-O2 and SF6 gases was assessed. 1×109 colony-forming units (CFUs of each bacterial isolate were placed on three polymer foils. The effects of pressure, power, distance from the source, and exposure time to plasma gases were optimized. The best conditions to inactivate the four bacteria were a 91%N2-9%O2 mixture and a 30-minute exposure time. SF6 gas was more efficient for all the tested isolates in as much as the treatment time was reduced to only three minutes. Therefore, low-pressure plasma could be used to sterilize heat and/or moisture-sensitive medical instruments.

  3. Development of a gas-cylinder-free plasma desorption/ionization system for on-site detection of chemical warfare agents.

    Science.gov (United States)

    Iwai, Takahiro; Kakegawa, Ken; Aida, Mari; Nagashima, Hisayuki; Nagoya, Tomoki; Kanamori-Kataoka, Mieko; Miyahara, Hidekazu; Seto, Yasuo; Okino, Akitoshi

    2015-06-02

    A gas-cylinder-free plasma desorption/ionization system was developed to realize a mobile on-site analytical device for detection of chemical warfare agents (CWAs). In this system, the plasma source was directly connected to the inlet of a mass spectrometer. The plasma can be generated with ambient air, which is drawn into the discharge region by negative pressure in the mass spectrometer. High-power density pulsed plasma of 100 kW could be generated by using a microhollow cathode and a laboratory-built high-intensity pulsed power supply (pulse width: 10-20 μs; repetition frequency: 50 Hz). CWAs were desorbed and protonated in the enclosed space adjacent to the plasma source. Protonated sample molecules were introduced to the mass spectrometer by airflow through the discharge region. To evaluate the analytical performance of this device, helium and air plasma were directly irradiated to CWAs in the gas-cylinder-free plasma desorption/ionization system and the protonated molecules were analyzed by using an ion-trap mass spectrometer. A blister agent (nitrogen mustard 3) and nerve gases [cyclohexylsarin (GF), tabun (GA), and O-ethyl S-2-N,N-diisopropylaminoethyl methylphosphonothiolate (VX)] in solution in n-hexane were applied to the Teflon rod and used as test samples, after solvent evaporation. As a result, protonated molecules of CWAs were successfully observed as the characteristic ion peaks at m/z 204, 181, 163, and 268, respectively. In air plasma, the limits of detection were estimated to be 22, 20, 4.8, and 1.0 pmol, respectively, which were lower than those obtained with helium plasma. To achieve quantitative analysis, calibration curves were made by using CWA stimulant dipinacolyl methylphosphonate as an internal standard; straight correlation lines (R(2) = 0.9998) of the peak intensity ratios (target per internal standard) were obtained. Remarkably, GA and GF gave protonated dimer ions, and the ratios of the protonated dimer ions to the protonated

  4. Synthesis of thin films in boron-carbon-nitrogen ternary system by microwave plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Kukreja, Ratandeep Singh

    The Boron Carbon Nitorgen (B-C-N) ternary system includes materials with exceptional properties such as wide band gap, excellent thermal conductivity, high bulk modulus, extreme hardness and transparency in the optical and UV range that find application in most fields ranging from micro-electronics, bio-sensors, and cutting tools to materials for space age technology. Interesting materials that belong to the B-C-N ternary system include Carbon nano-tubes, Boron Carbide, Boron Carbon Nitride (B-CN), hexagonal Boron Nitride ( h-BN), cubic Boron Nitride (c-BN), Diamond and beta Carbon Nitride (beta-C3N4). Synthesis of these materials requires precisely controlled and energetically favorable conditions. Chemical vapor deposition is widely used technique for deposition of thin films of ceramics, metals and metal-organic compounds. Microwave plasma enhanced chemical vapor deposition (MPECVD) is especially interesting because of its ability to deposit materials that are meta-stable under the deposition conditions, for e.g. diamond. In the present study, attempt has been made to synthesize beta-carbon nitride (beta-C3N4) and cubic-Boron Nitride (c-BN) thin films by MPECVD. Also included is the investigation of dependence of residual stress and thermal conductivity of the diamond thin films, deposited by MPECVD, on substrate pre-treatment and deposition temperature. Si incorporated CNx thin films are synthesized and characterized while attempting to deposit beta-C3N4 thin films on Si substrates using Methane (CH4), Nitrogen (N2), and Hydrogen (H2). It is shown that the composition and morphology of Si incorporated CNx thin film can be tailored by controlling the sequence of introduction of the precursor gases in the plasma chamber. Greater than 100mum size hexagonal crystals of N-Si-C are deposited when Nitrogen precursor is introduced first while agglomerates of nano-meter range graphitic needles of C-Si-N are deposited when Carbon precursor is introduced first in the

  5. Blood plasma clinical-chemical parameters as biomarker endpoints for organohalogen contaminant exposure in Norwegian raptor nestlings

    DEFF Research Database (Denmark)

    Sonne, Christian; Bustnes, Jan O; Herzke, Dorte

    2012-01-01

    Raptors are exposed to biomagnifying and toxic organohalogenated compounds (OHCs) such as organochlorines, brominated flame retardants and perfluorinated compounds. To investigate how OHC exposure may affect biochemical pathways we collected blood plasma from Norwegian northern goshawk (n=56......), golden eagle (n=12) and white-tailed eagle (n=36) nestlings during three consecutive breeding seasons. We found that blood plasma concentrations of calcium, sodium, creatinine, cholesterol, albumin, total protein, urea, inorganic phosphate, protein:creatinine, urea:creatinine and uric acid...

  6. Oral Administration of the Japanese Traditional Medicine Keishibukuryogan-ka-yokuinin Decreases Reactive Oxygen Metabolites in Rat Plasma: Identification of Chemical Constituents Contributing to Antioxidant Activity

    Directory of Open Access Journals (Sweden)

    Yosuke Matsubara

    2017-02-01

    Full Text Available Insufficient detoxification and/or overproduction of reactive oxygen species (ROS induce cellular and tissue damage, and generated reactive oxygen metabolites become exacerbating factors of dermatitis. Keishibukuryogan-ka-yokuinin (KBGY is a traditional Japanese medicine prescribed to treat dermatitis such as acne vulgaris. Our aim was to verify the antioxidant properties of KBGY, and identify its active constituents by blood pharmacokinetic techniques. Chemical constituents were quantified in extracts of KBGY, crude components, and the plasma of rats treated with a single oral administration of KBGY. Twenty-three KBGY compounds were detected in plasma, including gallic acid, prunasin, paeoniflorin, and azelaic acid, which have been reported to be effective for inflammation. KBGY decreased level of the diacron-reactive oxygen metabolites (d-ROMs in plasma. ROS-scavenging and lipid hydroperoxide (LPO generation assays revealed that gallic acid, 3-O-methylgallic acid, (+-catechin, and lariciresinol possess strong antioxidant activities. Gallic acid was active at a similar concentration to the maximum plasma concentration, therefore, our findings indicate that gallic acid is an important active constituent contributing to the antioxidant effects of KBGY. KBGY and its active constituents may improve redox imbalances induced by oxidative stress as an optional treatment for skin diseases.

  7. Remote viewing.

    Science.gov (United States)

    Scott, C

    1988-04-15

    Remote viewing is the supposed faculty which enables a percipient, sited in a closed room, to describe the perceptions of a remote agent visiting an unknown target site. To provide convincing demonstration of such a faculty poses a range of experimental and practical problems, especially if feedback to the percipient is allowed after each trial. The precautions needed are elaborate and troublesome; many potential loopholes have to be plugged and there will be strong temptations to relax standards, requiring exceptional discipline and dedication by the experimenters. Most reports of remote viewing experiments are rather superficial and do not permit assessment of the experimental procedures with confidence; in many cases there is clear evidence of particular loopholes left unclosed. Any serious appraisal of the evidence would have to go beyond the reports. Meanwhile the published evidence is far from compelling, and certainly insufficient to justify overthrow of well-established scientific principles.

  8. Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications.

    Science.gov (United States)

    Hirano, Takashi; Osaka, Taito; Sano, Yasuhisa; Inubushi, Yuichi; Matsuyama, Satoshi; Tono, Kensuke; Ishikawa, Tetsuya; Yabashi, Makina; Yamauchi, Kazuto

    2016-06-01

    We have developed a method of fabricating speckle-free channel-cut crystal optics with plasma chemical vaporization machining, an etching method using atmospheric-pressure plasma, for coherent X-ray applications. We investigated the etching characteristics to silicon crystals and achieved a small surface roughness of less than 1 nm rms at a removal depth of >10 μm, which satisfies the requirements for eliminating subsurface damage while suppressing diffuse scattering from rough surfaces. We applied this method for fabricating channel-cut Si(220) crystals for a hard X-ray split-and-delay optical system and confirmed that the crystals provided speckle-free reflection profiles under coherent X-ray illumination.

  9. Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications

    Science.gov (United States)

    Hirano, Takashi; Osaka, Taito; Sano, Yasuhisa; Inubushi, Yuichi; Matsuyama, Satoshi; Tono, Kensuke; Ishikawa, Tetsuya; Yabashi, Makina; Yamauchi, Kazuto

    2016-06-01

    We have developed a method of fabricating speckle-free channel-cut crystal optics with plasma chemical vaporization machining, an etching method using atmospheric-pressure plasma, for coherent X-ray applications. We investigated the etching characteristics to silicon crystals and achieved a small surface roughness of less than 1 nm rms at a removal depth of >10 μm, which satisfies the requirements for eliminating subsurface damage while suppressing diffuse scattering from rough surfaces. We applied this method for fabricating channel-cut Si(220) crystals for a hard X-ray split-and-delay optical system and confirmed that the crystals provided speckle-free reflection profiles under coherent X-ray illumination.

  10. Process control by optical emission spectroscopy during growth of a-C:H from a CH4 plasma by plasma-enhanced chemical vapour deposition

    DEFF Research Database (Denmark)

    Barholm-Hansen, C; Bentzon, MD; Vigild, Martin Etchells

    1994-01-01

    of the gas flow. Above a certain flow rate the intensity saturates, since the deposition process is limited by the power input. At low flow rates a large fraction of the feed gas is dissociated and the deposition is limited by the supply of feed gas. A relationship was found for the intensity of the CH 431...... in the process gas. The initial OH intensity was dependent on the ultimate vacuum prior to the plasma cleaning. A correlation was found between the vanishing of the OH line and the appearance of characteristic emission lines From sputtered electrode material....

  11. Growth kinetics and characterizations of gallium nitride thin films by remote PECVD

    Science.gov (United States)

    Choi, S. W.; Bachmann, K. J.; Lucovsky, G.

    1993-01-01

    Thin films of GaN have been deposited at relatively low growth temperatures by remote plasma-enhanced chemical-vapor deposition (RPECVD), using a plasma excited NH3, and trimethylgallium (TMG), injected downstream from the plasma. The activation energy for GaN growth has been tentatively assigned to the dissociation of NH groups as the primary N-atom precursors in the surface reaction with adsorbed TMG, or TMG fragments. At high He flow rates, an abrupt increase in the growth rate is observed and corresponds to a change in the reaction mechanism attributed to the formation of atomic N. XRD reveals an increased tendency to ordered growth in the (0001) direction with increasing growth temperature, He flow rate, and RF plasma power. IR spectra show the fundamental lattice mode of GaN at 530 cm without evidence for vibrational modes of hydrocarbon groups.

  12. Growth kinetics and characterizations of gallium nitride thin films by remote PECVD

    Science.gov (United States)

    Choi, S. W.; Bachmann, K. J.; Lucovsky, G.

    1993-01-01

    Thin films of GaN have been deposited at relatively low growth temperatures by remote plasma-enhanced chemical-vapor deposition (RPECVD), using a plasma excited NH3, and trimethylgallium (TMG), injected downstream from the plasma. The activation energy for GaN growth has been tentatively assigned to the dissociation of NH groups as the primary N-atom precursors in the surface reaction with adsorbed TMG, or TMG fragments. At high He flow rates, an abrupt increase in the growth rate is observed and corresponds to a change in the reaction mechanism attributed to the formation of atomic N. XRD reveals an increased tendency to ordered growth in the (0001) direction with increasing growth temperature, He flow rate, and RF plasma power. IR spectra show the fundamental lattice mode of GaN at 530 cm without evidence for vibrational modes of hydrocarbon groups.

  13. Development of open air silicon deposition technology by silane-free atmospheric pressure plasma enhanced chemical transport under local ambient gas control

    Science.gov (United States)

    Naito, Teruki; Konno, Nobuaki; Yoshida, Yukihisa

    2016-07-01

    Open air silicon deposition was performed by combining silane-free atmospheric pressure plasma-enhanced chemical transport and a newly developed local ambient gas control technology. The effect of air contamination on silicon deposition was investigated using a vacuum chamber, and the allowable air contamination level was confirmed to be 3 ppm. The capability of the local ambient gas control head was investigated numerically and experimentally. A safe and clean process environment with air contamination less than 1 ppm was achieved. Combining these technologies, a microcrystalline silicon film was deposited in open air, the properties of which were comparable to those of silicon films deposited in a vacuum chamber.

  14. Electron energy-loss spectroscopy analysis of low-temperature plasma-enhanced chemically vapor deposited a-C:H films

    Energy Technology Data Exchange (ETDEWEB)

    Nelson, A.J.; Benson, D.K.; Tracy, C.E.; Kazmerski, L.L.; Wager, J.F.

    1989-05-01

    Electron energy-loss spectroscopy (EELS) has been applied to the analysis of a-C:H films grown on various substrates by a unique low-temperature (<100 /sup 0/C) plasma-enhanced chemical vapor deposition (PECVD) process using ethylene and hydrogen gases. EELS data are used to characterize the relative amounts of fourfold coordinated sp/sup 3/ carbon bonding to threefold coordinated sp/sup 2/ carbon bonding as well as the relative order/disorder due to substrate effects. Ellipsometric and transmission measurements provide optical constants for the PECVD a-C:H films.

  15. Synthesis of few-layer graphene on a Ni substrate by using DC plasma enhanced chemical vapor deposition (PE-CVD)

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Jeong Hyuk; Castro, Edward Joseph; Hwang, Yong Gyoo; Lee, Choong Hun [Wonkwang University, Iksan (Korea, Republic of)

    2011-01-15

    In this work, few-layer graphene (FLG) was successfully grown on polycrystalline Ni a large scale by using DC plasma enhanced chemical vapor deposition (DC PE-CVD), which may serve as an alternative route in large-scale graphene synthesis. The synthesis time had an effect on the quality of the graphene produced. The applied DC voltage, on the other hand, influenced the minimization of the defect densities in the graphene grown. We also present a method of producing a free-standing polymethyl methacrylate (PMMA)/graphene membrane on a FeCl{sub 3(aq)} solution, which could then be transferred to the desired substrate.

  16. Mechanical alloying and sintering of aluminum reinforced with SiC nanopowders produced by plasma-enhanced chemical-vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Costa, J.; Fort, J.; Roura, P. [GRM, Dept. de Enginyeria Industrial, Universitat de Girona (Spain); Froyen, L. [MTM Katholieke Universiteit Leuven (Belgium); Viera, G.; Bertran, E. [FEMAN, Dept. Fisica Aplicada i Optica, Universitat de Barcelona (Spain)

    2000-07-01

    Nanometric powders of stoichiometric SiC have been synthesised by plasma-enhanced chemical-vapour deposition. These are constituted by amorphous particles with diameters ranging from 10 to 100 nm. Due to their high hydrogen content, a heat treatment at 900 C was needed to prevent spontaneous oxidation. The stabilized SiC powder was mechanically alloyed with aluminum particles of 40 {mu}m in diameter and the alloy was formed by hot isostatic sintering. The SiC content ranged from 0 to 5% in weight. A detailed analysis of the alloyed powder microstructure is presented as well as preliminary results concerning the mechanical properties after sintering. (orig.)

  17. Atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) of poly(diethylallylphosphate) coating: a char-forming protective coating for cellulosic textile.

    Science.gov (United States)

    Hilt, Florian; Boscher, Nicolas D; Duday, David; Desbenoit, Nicolas; Levalois-Grützmacher, Joëlle; Choquet, Patrick

    2014-01-01

    An innovative atmospheric pressure chemical vapor deposition method toward the deposition of polymeric layers has been developed. This latter involves the use of a nanopulsed plasma discharge to initiate the free-radical polymerization of an allyl monomer containing phosphorus (diethylallylphosphate, DEAP) at atmospheric pressure. The polymeric structure of the film is evidence by mass spectrometry. The method, highly suitable for the treatment of natural biopolymer substrate, has been carried out on cotton textile to perform the deposition of an efficient and conformal protective coating.

  18. Remote BCDGs

    Science.gov (United States)

    Erastova, L. K.

    2017-07-01

    The remote BCDGs with z>0.05 from the Second Byurakan Survey (SBS) are extracted. They are analogs of similar BCDGs in low-z Universe. The properties of these objects are discussed. Definitions of other physical types of active galaxies are considered and also clarified.

  19. Characterization of amorphous hydrogenated carbon formed by low-pressure inductively coupled plasma enhanced chemical vapor deposition using multiple low-inductance antenna units.

    Science.gov (United States)

    Tsuda, Osamu; Ishihara, Masatou; Koga, Yoshinori; Fujiwara, Shuzo; Setsuhara, Yuichi; Sato, Naoyuki

    2005-03-24

    Three-dimensional plasma enhanced chemical vapor deposition (CVD) of hydrogenated amorphous carbon (a-C:H) has been demonstrated using a new type high-density volumetric plasma source with multiple low-inductance antenna system. The plasma density in the volume of phi 200 mm x 100 mm is 5.1 x 10(10) cm(-3) within +/-5% in the lateral directions and 5.2 x 10(10)cm(-3) within +/-10% in the axial direction for argon plasma under the pressure of 0.1 Pa and the total power as low as 400 W. The uniformity of the thickness and refractive index is within +/-3.5% and +/-1%, respectively, for the a-C:H films deposited on the substrates placed on the six side walls, the top of the phi 60 mm x 80 mm hexagonal substrate holder in the pure toluene plasma under the pressure is as low as 0.04 Pa, and the total power is as low as 300 W. It is also found that precisely controlled ion bombardment by pulse biasing led to the explicit observation in Raman and IR spectra of the transition from polymer-like structure to diamond-like structure accompanied by dehydrogenation due to ion bombardment. Moreover, it is also concluded that the pulse biasing technique is effective for stress reduction without a significant degradation of hardness. The stress of 0.6 GPa and the hardness of 15 GPa have been obtained for 2.0 microm thick films deposited with the optimized deposition conditions. The films are durable for the tribology test with a high load of 20 N up to more than 20,000 cycles, showing the specific wear rate and the friction coefficient were 1.2 x 10(-7) mm3/Nm and 0.04, respectively.

  20. Chemical Characterisation of Bulk and Melt-spun Ribbons of NiMnIn alloy using Inductively Coupled Plasma Optical Emission Spectrometry

    Directory of Open Access Journals (Sweden)

    S.S. Kalyan Kamal

    2011-04-01

    Full Text Available Method development for the analysis of NiMnIn, a new magnetocaloric effect (MCE material using inductively coupled plasma optical emission spectrometry (ICPOES is discussed. Spectral interference of Ni and Mn on the analysis of In were studied. The process of method validation was carried out using various analytical techniques like conventional wet chemical techniques and instrumental techniques such as atomic absorption spectrometry. All the techniques show a close agreement in values, thus this method could be applied for regular analysis of NiMnIn alloys. A comparative chemical analysis of bulk and melt-spun ribbons of this alloy is also discussed.Defence Science Journal, 2011, 61(3, pp.270-274, DOI:http://dx.doi.org/10.14429/dsj.61.397

  1. Effects of boron addition on a-Si90Ge10:H films obtained by low frequency plasma enhanced chemical vapour deposition

    Science.gov (United States)

    Pérez, Arllene M.; Renero, Francisco J.; Zúñiga, Carlos; Torres, Alfonso; Santiago, César

    2005-06-01

    Optical, structural and electric properties of (a-(Si90Ge10)1-yBy:H) thin film alloys, deposited by low frequency plasma enhanced chemical vapour deposition, are presented. The chemical bonding structure has been studied by IR spectroscopy, while the composition was investigated by Raman spectroscopy. A discussion about boron doping effects, in the composition and bonding of samples, is presented. Transport of carriers has been studied by measurement of the conductivity dependence on temperature, which increases from 10-3 to 101 Ω-1 cm-1 when the boron content varies from 0 to 50%. Similarly, the activation energy is between 0.62 and 0.19 eV when the doping increases from 0 to 83%. The optical properties have been determined from the film's optical transmission, using Swanepoel's method. It is shown that the optical gap varies from 1.3 to 0.99 eV.

  2. Formation of distinctive structures of GaN by inductively-coupled-plasma and reactive ion etching under optimized chemical etching conditions

    Directory of Open Access Journals (Sweden)

    N. Okada

    2017-06-01

    Full Text Available We focused on inductively coupled plasma and reactive ion etching (ICP–RIE for etching GaN and tried to fabricate distinctive GaN structures under optimized chemical etching conditions. To determine the optimum chemical etching conditions, the flow rates of Ar and Cl2, ICP power, and chamber pressure were varied in the etching of c-plane GaN layers with stripe patterns. It was determined that the combination of Ar and Cl2 flow rates of 100 sccm, chamber pressure of 7 Pa, and ICP power of 800 W resulted in the most enhanced reaction, yielding distinctive GaN structures such as pillars with inverted mesa structures for c-plane GaN and a semipolar GaN layer with asymmetric inclined sidewalls. The selectivity and etching rate were also investigated.

  3. Formation of distinctive structures of GaN by inductively-coupled-plasma and reactive ion etching under optimized chemical etching conditions

    Science.gov (United States)

    Okada, N.; Nojima, K.; Ishibashi, N.; Nagatoshi, K.; Itagaki, N.; Inomoto, R.; Motoyama, S.; Kobayashi, T.; Tadatomo, K.

    2017-06-01

    We focused on inductively coupled plasma and reactive ion etching (ICP-RIE) for etching GaN and tried to fabricate distinctive GaN structures under optimized chemical etching conditions. To determine the optimum chemical etching conditions, the flow rates of Ar and Cl2, ICP power, and chamber pressure were varied in the etching of c-plane GaN layers with stripe patterns. It was determined that the combination of Ar and Cl2 flow rates of 100 sccm, chamber pressure of 7 Pa, and ICP power of 800 W resulted in the most enhanced reaction, yielding distinctive GaN structures such as pillars with inverted mesa structures for c-plane GaN and a semipolar GaN layer with asymmetric inclined sidewalls. The selectivity and etching rate were also investigated.

  4. Single liquid-source plasma enhanced metalorganic chemical vapor deposition of YBa sub 2 Cu sub 3 O sub 7-x thin films. Technical report

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, J.; Gardiner, R.; Kirlin, P.S.; Boerstler, R.W.; Steinbeck, J.

    1992-07-29

    High quality YBa2Cu3O7-x films were grown in-situ on LaAlO3 (100) by a novel single liquid source plasma-enhanced metalorganic chemical vapor deposition process. The metalorganic complexes M(thd)n, (thd = 2,2,6,6-tetramethyl-3,5-heptanedionate; M = Y, Ba, Cu) were dissolved in an organic solution and injected into a vaporizer immediately upstream of the reactor inlet The single liquid source technique dramatically simplifies current CVD processing and can significantly improve the process reproducibility. X-ray diffraction. measurements indicated that single phase, highly c-axis oriented YBa2Cu3O7-x was formed in-situ at a substrate temperature 680 degC. The as-deposited films exhibited a mirror-like surface, had transition temperature Tc = 89 K, Delta Tc < 1K, and Jc(77K) = 106 A/cm2. Plasma enhanced metalorganic chemical vapor deposition, YBCO, superconductors.

  5. Temperature-dependent electrical and photo-sensing properties of horizontally-oriented carbon nanotube networks synthesized by sandwich-growth microwave plasma chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Teng, I-Ju [Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan (China); Department of Electrophysics, National Chiao Tung University, Hsinchu 30010, Taiwan (China); Hsu, Hui-Lin [Department of Electrical and Computer Engineering, University of Toronto, Toronto M5S 3G4 (Canada); Jian, Sheng-Rui, E-mail: srjian@gmail.com [Department of Materials Science and Engineering, I-Shou University, Kaohsiung 84041, Taiwan (China); Wang, Li-Chun; Chen, Kai-Ling [Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan (China); Kuo, Cheng-Tzu, E-mail: kurt.kuotw@gmail.com [Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan (China); Pan, Fu-Ming [Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan (China); Wang, Wei-Hsiang [Teraxtal Technology Corporation, Hsinchu 30075, Taiwan (China); Juang, Jenh-Yih [Department of Electrophysics, National Chiao Tung University, Hsinchu 30010, Taiwan (China)

    2013-02-01

    The electrical and photo-sensing properties of horizontally-oriented interconnected carbon nanotube networks (CNT-NWs) prepared by means of a microwave plasma chemical vapor deposition sandwich-growth process are investigated. The temperature-dependent dark and illuminated current–voltage and transfer characteristics of CNT-NW-assisted devices are measured. Results show that the current–voltage characteristics of the devices exhibit nonlinear behavior, and the current can be further modulated by a gate voltage, revealing p-type semiconducting behavior with a device mobility of ∼ 14.5 cm{sup 2}/V·s and an on-off current ratio of ∼ 10{sup 3}. Moreover, when the CNT-NW-assisted devices are irradiated with 1.25–25 μm infrared (IR) from 300 to 11 K, the photo currents increase approximately 1.1- to 2.7-fold compared to the dark currents at ± 2 V bias voltage. Such results demonstrate that the presented CNT-NWs have high potential for IR photo-sensor applications. - Highlights: ► Horizontally-oriented interconnected carbon nanotube networks (CNT-NWs) were grown. ► A microwave plasma chemical vapor deposition sandwich-growth process was employed. ► Temperature-dependent electrical and photo-sensing properties were investigated. ► Devices based on CNT-NWs exhibit promising transistor characteristics. ► CNT-NWs are capable to detect light in the infrared wavelength range.

  6. Quantification of low levels of organochlorine pesticides using small volumes ({<=}100 {mu}l) of plasma of wild birds through gas chromatography negative chemical ionization mass spectrometry

    Energy Technology Data Exchange (ETDEWEB)

    Rivera-Rodriguez, Laura B. [Centro de Investigaciones Biologicas del Noroeste, S.C., Environmental Planning and Conservation Program, Mar Bermejo No. 195, Col. Playa Palo de Santa Rita, Ado. Postal 128, La Paz, BCS. 23090 (Mexico)]. E-mail: lrivera04@cibnor.mx; Rodriguez-Estrella, Ricardo [Centro de Investigaciones Biologicas del Noroeste, S.C., Environmental Planning and Conservation Program, Mar Bermejo No. 195, Col. Playa Palo de Santa Rita, Ado. Postal 128, La Paz, BCS. 23090 (Mexico); Ellington, James Jackson [National Exposure Research Laboratory, US Environmental Protection Agency, 960 College Station Road, Athens, GA 30605 (United States); Evans, John J. [National Exposure Research Laboratory, US Environmental Protection Agency, 960 College Station Road, Athens, GA 30605 (United States); Senior Service America Inc. (United States)

    2007-07-15

    A solid phase extraction and gas chromatography with negative chemical ionization mass spectrometry in scan mode (GC-NCI-MS) method was developed to identify and quantify for the first time low levels of organochlorine pesticides (OCs) in plasma samples of less than 100 {mu}l from wild birds. The method detection limits ranged from 0.012 to 0.102 pg/{mu}l and the method reporting limit from 0.036 to 0.307 pg/{mu}l for {alpha}, {gamma}, {beta} and {delta}-hexachlorocyclohexane (HCH), heptachlor, aldrin, heptachlor epoxide, endosulfan I, 1,1-dichloro-2,2-bis(p-chlorophenyl)ethylene (p,p'-DDE), dieldrin, endrin, endosulfan-II, endrin-aldehyde and endosulfan-sulfate. Pesticide levels in small serum samples from individual Falco sparverius, Sturnella neglecta, Mimus polyglottos and Columbina passerina were quantified. Concentrations ranged from not detected (n/d) to 204.9 pg/{mu}l for some OC pesticides. All levels in the food web in and around cultivated areas showed the presence of pesticides notwithstanding the small areas for agriculture existing in the desert of Baja California peninsula. - This technique allows small birds to be used as indicators of chemical contamination in habitats because pesticides can be quantified in very small volumes of plasma.

  7. Effects of Surface Modification of Nanodiamond Particles for Nucleation Enhancement during Its Film Growth by Microwave Plasma Jet Chemical Vapour Deposition Technique

    Directory of Open Access Journals (Sweden)

    Chii-Ruey Lin

    2014-01-01

    Full Text Available The seedings of the substrate with a suspension of nanodiamond particles (NDPs were widely used as nucleation seeds to enhance the growth of nanostructured diamond films. The formation of agglomerates in the suspension of NDPs, however, may have adverse impact on the initial growth period. Therefore, this paper was aimed at the surface modification of the NDPs to enhance the diamond nucleation for the growth of nanocrystalline diamond films which could be used in photovoltaic applications. Hydrogen plasma, thermal, and surfactant treatment techniques were employed to improve the dispersion characteristics of detonation nanodiamond particles in aqueous media. The seeding of silicon substrate was then carried out with an optimized spin-coating method. The results of both Fourier transform infrared spectroscopy and dynamic light scattering measurements demonstrated that plasma treated diamond nanoparticles possessed polar surface functional groups and attained high dispersion in methanol. The nanocrystalline diamond films deposited by microwave plasma jet chemical vapour deposition exhibited extremely fine grain and high smooth surfaces (~6.4 nm rms on the whole film. These results indeed open up a prospect of nanocrystalline diamond films in solar cell applications.

  8. Influence of plasma density on the chemical composition and structural properties of pulsed laser deposited TiAlN thin films

    Energy Technology Data Exchange (ETDEWEB)

    Quiñones-Galván, J. G.; Camps, Enrique [Departamento de Física, Instituto Nacional de Investigaciones Nucleares, Apartado Postal 18-1027, México D.F. C.P. 11801 (Mexico); Muhl, S. [Instituto de Investigaciones en Materiales, UNAM, México D.F. C.P. 04510 (Mexico); Flores, M. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, Apdo. Postal 307, C.P. 45101 Zapopan, Jalisco (Mexico); Campos-González, E. [Departamento de Física, CINVESTAV-IPN, Apdo. Postal 14-740, México D.F. 07360 (Mexico)

    2014-05-15

    Incorporation of substitutional Al into the TiN lattice of the ternary alloy TiAlN results in a material with improved properties compared to TiN. In this work, TiAlN thin films were grown by the simultaneous ablation of Ti and Al targets in a nitrogen containing reactive atmosphere. The deposit was formed on silicon substrates at low deposition temperature (200 °C). The dependence of the Al content of the films was studied as a function of the ion density of the plasma produced by the laser ablation of the Al target. The plasma parameters were measured by means of a planar Langmuir probe and optical emission spectroscopy. The chemical composition of the films was measured by energy dispersive X-ray spectroscopy. The results showed a strong dependence of the amount of aluminum incorporated in the films with the plasma density. The structural characterization of the deposits was carried out by Raman spectroscopy, X-ray diffraction, and transmission electron microscopy, where the substitutional incorporation of the Al into the TiN was demonstrated.

  9. Impact of Hydrocarbon Control in Ultraviolet-Assisted Restoration Process for Extremely Porous Plasma Enhanced Chemical Vapor Deposition SiOCH Films with k = 2.0

    Science.gov (United States)

    Kimura, Yosuke; Ishikawa, Dai; Nakano, Akinori; Kobayashi, Akiko; Matsushita, Kiyohiro; de Roest, David; Kobayashi, Nobuyoshi

    2012-05-01

    We investigated the effects of UV-assisted restoration on porous plasma-enhanced chemical vapor deposition (PECVD) SiOCH films with k = 2.0 and 2.3 having high porosities. By applying the UV-assisted restoration to O2-plasma-damaged films with k = 2.0 and 2.3, the recovery of the k-value was observed on the k = 2.3 film in proportion to -OH group reduction. However, the k = 2.0 film did not show recovery in spite of -OH group reduction. We found that hydrocarbon content in the k = 2.0 film was significantly increased by the UV-assisted restoration compared with the k = 2.3 film. According to these findings, we optimized the UV-assisted restoration to achieve improved controllability of the hydrocarbon uptake in the k = 2.0 film and confirmed the recovery of the k-value for O2-plasma-damaged film. Thus, adjusting the hydrocarbon uptake was crucial for restoring extremely porous SiOCH film.

  10. Application of pentafluorophenyl hydrazine derivatives to the analysis of nabumetone and testosterone in human plasma by liquid chromatography-atmospheric pressure chemical ionization-tandem mass spectrometry.

    Science.gov (United States)

    Sheen, J F; Her, G R

    2004-12-01

    Two carbonyl compounds, nabumetone and testosterone, were derivatized with pentafluorophenyl hydrazine (PFPH) and analyzed by atmospheric-pressure chemical-ionization mass spectrometry. The PFPH derivatives underwent dissociative electron capture in negative-ion APCI (ECAPCI) and gave intense [M-20](-) ions in the mass spectra. In positive-ion APCI, the PFPH derivatives underwent efficient protonation and gave intense [M + H](+) ions in the mass spectra. In CID, the major product ions of the [M-20](-) ions in ECAPCI corresponded to the partial moiety of PFPH. In contrast, the major product ions of [M + H](+) corresponded to the partial moiety of the analyte. By using selected reaction monitoring (SRM) detection, low pg of nabumetone (1 pg) and testosterone (7 pg) could be detected in both ECAPCI and positive-ion APCI. In comparison with the detection limits (SRM) of the underivatized analytes, use of the PFPH derivatives resulted in 2500-fold and 35-fold sensitivity enhancements for nabumetone and testosterone, respectively. The PFPH derivatives were applied to the analysis of nabumetone and testosterone in human plasma by both ECAPCI and positive-ion APCI and were found to enable detection of 0.1 ng mL(-1) nabumetone in spiked plasma. For testosterone, endogenous testosterone in female plasma was detected in both ECAPCI and positive-ion APCI.

  11. Quantitative determination of methylphenidate in plasma by gas chromatography negative ion chemical ionisation mass spectrometry using o-(pentafluorobenzyloxycarbonyl)-benzoyl derivatives.

    Science.gov (United States)

    Leis, Hans J; Schütz, Helmut; Windischhofer, Werner

    2011-06-01

    The use of a novel electrophoric derivatisation reagent, o-(pentafluorobenzyloxycarbonyl)-benzoyl chloride, for the quantitative determination of methylphenidate in plasma is described. The drug can be quantitatively measured down to 72 pg/mL plasma using only 250 μL of sample due to the extraordinary sensitivity of the derivatives under negative ion chemical ionisation mass spectrometry. Plasma samples were made alkaline with carbonate buffer and treated with extraction solvent n-hexane and reagent solution for 30 min, which, after concentration, was measured by GC-NICI-MS. The method is rapid as extraction and derivatisation occur in one single step. A stable isotope-labelled internal standard was used and its synthesis described. Full validation data are given to demonstrate the usefulness of the assay, including specificity, linearity, accuracy and precision, long-term stability, short-term stability, freeze-thaw stability, stock solution stability, autosampler stability, aliquot analysis, robustness, matrix effect, and prospective analytical batch size accuracy. The method has been successfully applied to pharmacokinetic profiling of the drug after oral application.

  12. AlN thin films prepared by ArF plasma assisted PLD. Role of process conditions on electronic and chemical-morphological properties

    Science.gov (United States)

    Cappelli, E.; Trucchi, D. M.; Orlando, S.; Valentini, V.; Mezzi, A.; Kaciulis, S.

    2014-02-01

    Aluminium nitride thin films were deposited on n-Si substrates by RF plasma activated reactive pulsed laser deposition (PLD). An ArF excimer pulsed laser, 10 Hz and 2.5 J/cm2 energy fluence, has been used to ablate a pure Al target in a reactive atmosphere of N2 plasma (generated by a RF source), at varying processing parameters (substrate temperature, time, and N2 plasma configuration). We studied the dependence and correlation of structural and electronic properties with the experimental conditions. The chemical composition of deposited material has been determined by both Raman and X-ray photoelectron spectroscopy (XPS). Electrical resistivity has been evaluated by the sheet resistance method. Both spectroscopic characterizations (Raman and XPS) show a strong dependence in the formation of AlN on the deposition temperature. At low temperatures, there is little formation of nitride, with a prevalence of aluminium oxide, while at higher temperatures the N uptake increases, with AlN formation. Raman analysis also highlights the formation of nano-structures, for temperatures ≥400∘C. These material characteristics have a fundamental influence on the electronic properties. Indeed, electrical resistivity properties have been found to be strongly dependent on the film structure, nitrogen incorporation, and presence of mixed oxide compounds, closely related to deposition temperature.

  13. Chemical Phase and Valence Studies of Plasma Sprayed Coatings: EDXRD and X-ray Absorption Spectroscopy (XAS) Results

    Science.gov (United States)

    2010-06-01

    powder α-Al2O3 anatase -TiO2 EDXRD –structure nano-alumina/titania feed powder α-Al2O3 anatase -TiO2 cubic-CeO2 cubic-ZrO2 EDXRD –structure ε ε ε ε ε e...Ar, N2 Plasma spray deposition (oxidizing agent) O2 α-Al2O3 anatase -TiO2 Ce3+-O !!! cubic-ZrO2 cubic-Ce4+O2 Inert gas Ar, N2 Plasma spray deposition...H2 (reducing agent) (oxidizing agent) O2 α-Al2O3 anatase -TiO2 Ce3+-O ok? cubic-ZrO2 cubic-Ce4+O2 t2g eg L3 p →d ε continuum d DOS e.g. octahedral

  14. Anisotropic growth of single-crystal graphite plates by nickel-assisted microwave-plasma chemical-vapor deposition

    Science.gov (United States)

    Badzian, Teresa; Badzian, Andrzej; Roy, Rustum; Cheng, Shang-Cong

    2000-02-01

    Growth of single-crystal graphite free-standing plates has been achieved by a microwavehydrogen-plasma etching of graphite powder and nickel mesh. The plates resemble a knife blade and grow in the direction with long crystals exceeding 100 μm. Hexagonal growth features at the edges and electron diffraction patterns confirm the single-crystal nature of these ultrathin plates. Electron microprobe and Raman spectroscopy indicate the presence of graphite. Diamond crystals nucleate on these plates and they grow simultaneously. We suggest that the paradoxical growth of graphite in a hydrogen plasma, under conditions in which graphite is usually etched away, is possible because of a protective coating by a Ni-C-H phase. This thin coating allows for transport of carbon atoms from the gas phase to the growing graphite surface.

  15. Effects of O2 Plasma Treatment on the Chemical and Electric Properties of Low-k SiOF Films

    Institute of Scientific and Technical Information of China (English)

    2001-01-01

    With the progress of ULS1 technology, materials with low dielectric constant are required to replace SiO2 film as the interlayer to scale down the interconnection delay. Fluorinated Si oxide thin films (SiOF) are a promising material for the low dielectric constant and the process compatibility in existing technology. However, SiOF films are liable to absorb moisture. when exposed to air. By treating the SiOF films with O2 plasma, it was found that the moisture resistibility of SiOF films was remarkably improved. The mechanism of the improvement in stability of dielectric constant was investigated. The results show that: 1) F atoms dissociated from the films and the bond angle of Si-O-Si decreased. 2) The plasma treatment enhanced the strength of Si-F bonds by removing unstable =SiF2 structures in the films. Resistibility of SiOF films in moisture was improved.

  16. Chemical modification of extracellular matrix by cold atmospheric plasma-generated reactive species affects chondrogenesis and bone formation.

    Science.gov (United States)

    Eisenhauer, Peter; Chernets, Natalie; Song, You; Dobrynin, Danil; Pleshko, Nancy; Steinbeck, Marla J; Freeman, Theresa A

    2016-09-01

    The goal of this study was to investigate whether cold plasma generated by dielectric barrier discharge (DBD) modifies extracellular matrices (ECM) to influence chondrogenesis and endochondral ossification. Replacement of cartilage by bone during endochondral ossification is essential in fetal skeletal development, bone growth and fracture healing. Regulation of this process by the ECM occurs through matrix remodelling, involving a variety of cell attachment molecules and growth factors, which influence cell morphology and protein expression. The commercially available ECM, Matrigel, was treated with microsecond or nanosecond pulsed (μsp or nsp, respectively) DBD frequencies conditions at the equivalent frequencies (1 kHz) or power (~1 W). Recombinant human bone morphogenetic protein-2 was added and the mixture subcutaneously injected into mice to simulate ectopic endochondral ossification. Two weeks later, the masses were extracted and analysed by microcomputed tomography. A significant increase in bone formation was observed in Matrigel treated with μsp DBD compared with control, while a significant decrease in bone formation was observed for both nsp treatments. Histological and immunohistochemical analysis showed Matrigel treated with μsp plasma increased the number of invading cells, the amount of vascular endothelial growth factor and chondrogenesis while the opposite was true for Matrigel treated with nsp plasma. In support of the in vivo Matrigel study, 10 T1/2 cells cultured in vitro on μsp DBD-treated type I collagen showed increased expression of adhesion proteins and activation of survival pathways, which decreased with nsp plasma treatments. These results indicate DBD modification of ECM can influence cellular behaviours to accelerate or inhibit chondrogenesis and endochondral ossification. Copyright © 2016 John Wiley & Sons, Ltd. Copyright © 2016 John Wiley & Sons, Ltd.

  17. Effect of an oxygen plasma on the physical and chemical properties of several fluids for the Liquid Droplet Radiator

    Science.gov (United States)

    Gulino, Daniel A.; Coles, Carolyn E.

    1987-01-01

    The Liquid Droplet Radiator is one of several radiator systems currently under investigation by NASA Lewis Research Center. It involves the direct exposure of the radiator working fluid to the space environment. An area of concern is the potential harmful effects of the low-Earth-orbit atomic oxygen environment on the radiator working fluid. To address this issue, seven candidate fluids were exposed to an oxygen plasma environment in a laboratory plasma asher. The fluids studied included Dow Corning 705 Diffusion Pump Fluid, polymethylphenylsiloxane and polydimethylsiloxane, both of which are experimental fluids made by Dow Corning, Fomblin Z25, made by Montedison, and three fluids from the Krytox family of fluids, Krytox 143AB, 1502, and 16256, which are made by DuPont. The fluids were characterized by noting changes in visual appearance, physical state, mass, and infrared spectra. Of the fluids tested, the Fomblin and the three Krytoxes were the least affected by the oxygen plasma. The only effect noted was a change in mass, which was most likely due to an oxygen-catalyzed depolymerization of the fluid molecule.

  18. Tight-binding quantum chemical molecular dynamics simulations for the elucidation of chemical reaction dynamics in SiC etching with SF6/O2 plasma.

    Science.gov (United States)

    Ito, Hiroshi; Kuwahara, Takuya; Kawaguchi, Kentaro; Higuchi, Yuji; Ozawa, Nobuki; Kubo, Momoji

    2016-03-21

    We used our etching simulator [H. Ito et al., J. Phys. Chem. C, 2014, 118, 21580-21588] based on tight-binding quantum chemical molecular dynamics (TB-QCMD) to elucidate SiC etching mechanisms. First, the SiC surface is irradiated with SF5 radicals, which are the dominant etchant species in experiments, with the irradiation energy of 300 eV. After SF5 radicals bombard the SiC surface, Si-C bonds dissociate, generating Si-F, C-F, Si-S, and C-S bonds. Then, etching products, such as SiS, CS, SiFx, and CFx (x = 1-4) molecules, are generated and evaporated. In particular, SiFx is the main generated species, and Si atoms are more likely to vaporize than C atoms. The remaining C atoms on SiC generate C-C bonds that may decrease the etching rate. Interestingly, far fewer Si-Si bonds than C-C bonds are generated. We also simulated SiC etching with SF3 radicals. Although the chemical reaction dynamics are similar to etching with SF5 radicals, the etching rate is lower. Next, to clarify the effect of O atom addition on the etching mechanism, we also simulated SiC etching with SF5 and O radicals/atoms. After bombardment with SF5 radicals, Si-C bonds dissociate in a similar way to the etching without O atoms. In addition, O atoms generate many C-O bonds and COy (y = 1-2) molecules, inhibiting the generation of C-C bonds. This indicates that O atom addition improves the removal of C atoms from SiC. However, for a high O concentration, many C-C and Si-Si bonds are generated. When the O atoms dissociate the Si-C bonds and generate dangling bonds, the O atoms terminate only one or two dangling bonds. Moreover, at high O concentrations there are fewer S and F atoms to terminate the dangling bonds than at low O concentration. Therefore, few dangling bonds of dissociated Si and C atoms are terminated, and they form many Si-Si and C-C bonds. Furthermore, we propose that the optimal O concentration is 50-60% because both Si and C atoms generate many etching products producing fewer C

  19. Quantification of monosialogangliosides in human plasma through chemical derivatization for signal enhancement in LC–ESI-MS

    Energy Technology Data Exchange (ETDEWEB)

    Huang, Qianyang; Liu, Danting [Clinical Chemistry Program, Department of Chemistry, Cleveland State University, 2121 Euclid Avenue, Cleveland, OH 44115 (United States); Xin, Baozhong; Cechner, Karen [DDC Clinic, Center for Special Needs Children, 14567 Madison Road, Middlefield, OH 44062 (United States); Zhou, Xiang [Clinical Chemistry Program, Department of Chemistry, Cleveland State University, 2121 Euclid Avenue, Cleveland, OH 44115 (United States); Wang, Heng, E-mail: Wang@ddcclinic.org [DDC Clinic, Center for Special Needs Children, 14567 Madison Road, Middlefield, OH 44062 (United States); Zhou, Aimin, E-mail: a.zhou@csuohio.edu [Clinical Chemistry Program, Department of Chemistry, Cleveland State University, 2121 Euclid Avenue, Cleveland, OH 44115 (United States); Center for Gene Regulation in Health and Diseases, Cleveland State University, 2121 Euclid Avenue, Cleveland, OH 44115 (United States)

    2016-07-27

    Gangliosides are found in abundance in the central nervous system of vertebrates. Their metabolic disruption and dysfunction are associated with various neurodegenerative disorders such as Alzheimer's disease and Parkinson's disease. In order to improve our understanding of the etiology of these diseases, analytical ganglioside assays with sufficient specificity and sensitivity in relevant biological matrices are required. In the present work we have developed and validated a reverse-phase ultra-performance liquid chromatography (UPLC)/tandem mass spectrometry (MS) method for determining monosialogangliosides GM1, GM2, and GM3 present in human plasma. Compared with our previous method, this method enhanced, by 15 fold, MS responses of the analytes by employing 2-(2-Pyridilamino)-ethylamine (PAEA) & 4-(4, 6-Dimethoxy-1, 3, 5-triazin-2-yl)-4-methylmorpholinium chloride (DMTMM)-based derivatization. The analytes and internal standards were derivatized with PAEA&DMTMM after extraction from plasma using a protein precipitation procedure. They were then purified using liquid–liquid partitioning. When the samples were then analyzed by UPLC-MS/MS with a multiple reaction monitoring (MRM) mode, we achieved superior sensitivity and specificity. This method was evaluated for extraction recovery, calibration linearity, precision, accuracy, and lower limit of quantification (LLOQ). The validated method was successfully applied to monitor monosialoganglioside levels in the plasma from patients with GM3 synthase deficiency. With significantly increased sensitivity, we have, for the first time, detected a significant amount of GM3 in the affected patients. - Highlights: • A UPLC/MS/MS method for analyzing monosialogangliosides GM1, GM2, and GM3 in human plasma was developed and validated. • PAEA&DMTMM-based derivatization greatly improved the sensitivity. • The method was applied to measure GM1, GM2, and GM3 in the plasma from the patients with GM3 synthase

  20. Simultaneous synthesis of nanodiamonds and graphene via plasma enhanced chemical vapor deposition (MW PE-CVD) on copper.

    Science.gov (United States)

    Gottlieb, Steven; Wöhrl, Nicolas; Schulz, Stephan; Buck, Volker

    2016-01-01

    The simultaneous growth of both nanodiamonds and graphene on copper samples is described for the first time. A PE-CVD process is used to synthesize graphene layers and nanodiamond clusters from a hydrogen/methane gas mixture as it is typically done successfully in thermal CVD processes for graphene synthesis. However, the standard thermal CVD process is not without problems since the deposition of graphene is affected by the evaporation of a notable amount of copper caused by the slow temperature increase typical for thermal CVD resulting in a long process time. In sharp contrast, the synthesis of graphene by PE-CVD can circumvent this problem by substantially shortening the process time at holding out the prospect of a lower substrate temperature. The reduced thermal load and the possibility to industrially scale-up the PE-CVD process makes it a very attractive alternative to the thermal CVD process with respect to the graphene production in the future. Nanodiamonds are synthesized in PE-CVD reactors for a long time because these processes offer a high degree of control over the film's nanostructure and simultaneously providing a significant high deposition rate. To model the co-deposition process, the three relevant macroscopic parameters (pressure, gas mixture and microwave power) are correlated with three relevant process properties (plasma ball size, substrate temperature and C2/Hα-ratio) and the influence on the quality of the deposited carbon allotropes is investigated. For the evaluation of the graphene as well as the nanodiamond quality, Raman spectroscopy used whereas the plasma properties are measured by optical methods. It is found that the diamond nucleation can be influenced by the C2/Hα-ratio in the plasma, while the graphene quality remains mostly unchanged by this parameter. Moreover it is derived from the experimental data that the direct plasma contact with the copper surface is beneficial for the nucleation of the diamond while the growth and

  1. Lunar remote sensing and measurements

    Science.gov (United States)

    Moore, H.J.; Boyce, J.M.; Schaber, G.G.; Scott, D.H.

    1980-01-01

    Remote sensing and measurements of the Moon from Apollo orbiting spacecraft and Earth form a basis for extrapolation of Apollo surface data to regions of the Moon where manned and unmanned spacecraft have not been and may be used to discover target regions for future lunar exploration which will produce the highest scientific yields. Orbital remote sensing and measurements discussed include (1) relative ages and inferred absolute ages, (2) gravity, (3) magnetism, (4) chemical composition, and (5) reflection of radar waves (bistatic). Earth-based remote sensing and measurements discussed include (1) reflection of sunlight, (2) reflection and scattering of radar waves, and (3) infrared eclipse temperatures. Photographs from the Apollo missions, Lunar Orbiters, and other sources provide a fundamental source of data on the geology and topography of the Moon and a basis for comparing, correlating, and testing the remote sensing and measurements. Relative ages obtained from crater statistics and then empirically correlated with absolute ages indicate that significant lunar volcanism continued to 2.5 b.y. (billion years) ago-some 600 m.y. (million years) after the youngest volcanic rocks sampled by Apollo-and that intensive bombardment of the Moon occurred in the interval of 3.84 to 3.9 b.y. ago. Estimated fluxes of crater-producing objects during the last 50 m.y. agree fairly well with fluxes measured by the Apollo passive seismic stations. Gravity measurements obtained by observing orbiting spacecraft reveal that mare basins have mass concentrations and that the volume of material ejected from the Orientale basin is near 2 to 5 million km 3 depending on whether there has or has not been isostatic compensation, little or none of which has occurred since 3.84 b.y. ago. Isostatic compensation may have occurred in some of the old large lunar basins, but more data are needed to prove it. Steady fields of remanent magnetism were detected by the Apollo 15 and 16 subsatellites

  2. Advanced laser remote sensing

    Energy Technology Data Exchange (ETDEWEB)

    Schultz, J.; Czuchlewski, S.; Karl, R. [and others

    1996-11-01

    This is the final report of a three-year, Laboratory-Directed Research and Development (LDRD) project at the Los Alamos National Laboratory. Remote measurement of wind velocities is critical to a wide variety of applications such as environmental studies, weather prediction, aircraft safety, the accuracy of projectiles, bombs, parachute drops, prediction of the dispersal of chemical and biological warfare agents, and the debris from nuclear explosions. Major programs to develop remote sensors for these applications currently exist in the DoD and NASA. At present, however, there are no real-time, three-dimensional wind measurement techniques that are practical for many of these applications and we report on two new promising techniques. The first new technique uses an elastic backscatter lidar to track aerosol patterns in the atmosphere and to calculate three dimensional wind velocities from changes in the positions of the aerosol patterns. This was first done by Professor Ed Eloranta of the University of Wisconsin using post processing techniques and we are adapting Professor Eloranta`s algorithms to a real-time data processor and installing it in an existing elastic backscatter lidar system at Los Alamos (the XM94 helicopter lidar), which has a compatible data processing and control system. The second novel wind sensing technique is based on radio-frequency (RF) modulation and spatial filtering of elastic backscatter lidars. Because of their compactness and reliability, solid state lasers are the lasers of choice for many remote sensing applications, including wind sensing.

  3. Tailoring the chemical composition and dispersion behavior of fluorinated graphene oxide via CF{sub 4} plasma

    Energy Technology Data Exchange (ETDEWEB)

    Zhou, Baoming; Qian, Xiaoming; Li, Mingming; Ma, Jilan; Liu, Liangsen, E-mail: 83019163@163.com; Hu, Chuansheng; Xu, Zhiwei; Jiao, Xiaoning [Tianjin Polytechnic University, Key Laboratory of Advanced Braided Composites, Ministry of Education, School of Textiles (China)

    2015-03-15

    Grafting fluorine onto graphene oxide (GO) by CF{sub 4} plasma treatment was investigated in this study. An easy, low-cost, and effective synthesis of the high-dispersive fluorinated GO (FGO) with tunable atomic ratio of F/O (R{sub F/O}) has been realized and the R{sub F/O} can be readily manipulated just by adjusting the reaction time. The influence of plasma treatment time on the microstructure, morphology, and dispersion of graphene nanosheets was systematically analyzed. X-ray photoelectron spectroscopy analysis confirmed that fluorine has been grafted onto graphene, and the R{sub F/O} was gradually increased to 3.54 for the FGO treated for 20 min. Morphology investigation indicated that etching on the edge of GO occurred during the fluorination. The dispersion performance of FGO in water reduced continuously, which in N,N-dimethylacetamide (DMAc) increased firstly and then decreased with the increase in plasma time. The zeta potentials of FGO in DMAc reached the lowest at −28.6 mV when GO was treated for 10 min. The dispersion of FGO in water should be attributed to the decrease of C–O group, while there was a same variation trend of FGO zeta potential in DMAc as the value of C–F content, regardless of R{sub F/O}, CF{sub 2} group content and CF{sub 3} group content. The GO film was super-hydrophilic and the film of FGO treated for 20 min was found to be neither hydrophilic nor hydrophobic.

  4. A remote-controlled generation of gold@polydopamine (core@shell) nanoparticles via physical-chemical stimuli of polydopamine/gold composites

    Science.gov (United States)

    Lee, Yi Seul; Bae, Ji Young; Koo, Hye Young; Lee, Young Boo; Choi, Won San

    2016-03-01

    We present the synthesis of polydopamine particle-gold composites (PdopP-Au) and unique release of Au@Pdop core@shell nanoparticles (NPs) from the PdopP-Au upon external stimuli. The PdopP-Au was prepared by controlled synthesis of AuNPs on the Pdop particles. Upon near infrared (NIR) irradiation or NaBH4 treatment on the PdopP-Au, the synthesized AuNPs within the PdopPs could be burst-released as a form of Au@Pdop NPs. The PdopP-Au composite showed outstanding photothermal conversion ability under NIR irradiation due to the ultrahigh loading of the AuNPs within the PdopPs, leading to a remote-controlled explosion of the PdopP-Au and rapid formation of numerous Au@Pdop NPs. The release of the Au@Pdop NPs could be instantly stopped or re-started by off or reboot of NIR, respectively. The structure of the released Au@Pdop NPs is suitable for a catalyst or adsorbent, thus we demonstrated that the PdopP-Au composite exhibited excellent and sustained performances for environmental remediation due to its capability of the continuous production of fresh catalysts or adsorbents during the reuse.

  5. Monocyte/macrophage and protein interactions with non-fouling plasma polymerized tetraglyme and chemically modified polystyrene surfaces: In vitro and in vivo studies

    Science.gov (United States)

    Shen, Mingchao

    2001-07-01

    Biomaterials become encapsulated by fibrous tissues after implantation in soft tissues. Monocytes and macrophages are believed to play important roles in this response. The hypothesis tested in this dissertation is that material surface chemistry determines the amount of adsorbed proteins, which mediate monocyte adhesion, activation, and the foreign body response. On chemically modified polystyrene surfaces, monocyte adhesion in vitro was promoted by preadsorbed fibrinogen, fibronectin, and IgG, and increased with increasing amount of adsorbed fibrinogen. Adsorbed proteins and material surface chemistry mediated monocyte activation. TNFalpha release, procoagulant activity, and multinucleated foreign body giant cell (FBGC) formation was at least two-fold higher on IgG than other protein adsorbed surfaces. Adsorbed IgG and fibrinogen triggered monocyte intracellular calcium changes. FBGC formation was the highest on the hydrophobic polystyrene surface. Materials that greatly reduce non-specific protein adsorption may reduce the foreign body response to implanted materials. Radio-frequency plasma polymerized tetraglyme (CH3O(CH2CH2O)4CH 3) surfaces contained PEO-like chemical species and reduced fibrinogen adsorption to less than 10 ng/cm2. Monocyte adhesion to tetraglyme in vitro was also greatly reduced. Monocyte adhesion correlated linearly to the amount of adsorbed fibrinogen on a series of tetraglyme surfaces deposited at different plasma powers. Multivariate analysis using partial least squares regression identified the key surface spectra variables from electron spectroscopy for chemical analysis (ESCA) and time of flight secondary ion mass spectrometry (ToF-SIMS) that contributed to the non-fouling properties of tetraglyme. However, leukocyte adhesion to surfaces implanted subcutaneously in mice for 1 or 28 days did not correlate with protein adsorption and was higher on tetraglyme than the FEP control. Fibrous encapsulation to tetraglyme implanted for 28 days

  6. Modelling and experimentation of the SO{sub 2} remotion through a plasma out of thermal equilibrium; Modelacion y experimentacion de la remocion del SO{sub 2} mediante un plasma fuera de equilibrio termico

    Energy Technology Data Exchange (ETDEWEB)

    Moreno S, H. [Instituto Tecnologico de Toluca, Metepec, Estado de Mexico (Mexico); Pacheco P, M.; Pacheco S, J.; Cruz A, A. [ININ, 52045 Ocoyoacac, Estado de Mexico (Mexico)]. e-mail: hilda_saavedra@yahoo.com.mx

    2005-07-01

    In spite of the measures that have taken for the decrease of the emitted pollution by mobile sources (''Today it doesn't Circulate'', implementation of catalysts in those exhaust pipes,...), the pollution in the Valley of Mexico area overcomes the limits fixed by Mexican standards several days each year. It is foreseen that for 2020 those emissions of pollutants will be increase considerably, as example we can mention to the sulfur oxides which will be increase a 48% with regard to 1998. The purpose of this work is of proposing a technique for the degradation of the sulfur dioxide (SO{sub 2}) that consists in introducing this gas to a plasma out of thermal equilibrium where its were formed key radicals (O, OH) for its degradation. The proposed reactor has the advantage of combining the kindness of the dielectric barrier discharge and of corona discharge, besides working to atmospheric pressure and having small dimensions. The first obtained results of the modelling of the degradation of the SO{sub 2} in plasma as well as those experimentally obtained are presented. (Author)

  7. Quantitative analysis of surface amine groups on plasma-polymerized ethylenediamine films using UV-visible spectroscopy compared to chemical derivatization with FT-IR spectroscopy, XPS and TOF-SIMS

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Jinmo [Department of Physics, Brain Korea 21 Physics Research Division and Institute of Basic Science, Sungkyunkwan University (SKKU), Suwon 440-746 (Korea, Republic of); Division of Advanced Technology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-600 (Korea, Republic of); Jung, Donggeun [Department of Physics, Brain Korea 21 Physics Research Division and Institute of Basic Science, Sungkyunkwan University (SKKU), Suwon 440-746 (Korea, Republic of); Park, Yongsup [Division of Advanced Technology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-600 (Korea, Republic of); Kim, Yongki [Department of Physics, Brain Korea 21 Physics Research Division and Institute of Basic Science, Sungkyunkwan University (SKKU), Suwon 440-746 (Korea, Republic of); Division of Advanced Technology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-600 (Korea, Republic of); Moon, Dae Won [Division of Advanced Technology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-600 (Korea, Republic of); Lee, Tae Geol [Division of Advanced Technology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-600 (Korea, Republic of)]. E-mail: tglee@kriss.re.kr

    2007-02-28

    A quantitative analysis of the surface density of amine groups on a plasma-polymerized ethylenediamine thin film deposited on a platinum surface using inductively coupled plasma chemical vapor deposition method is described. UV-visible spectroscopy together with a chemical derivatization technique using Fourier transform infrared (FT-IR) spectroscopy was used to obtain the quantitative information. Chemical tags of pentafluorobenzaldehyde were hybridized with the surface amine groups and were easily detected due to the characteristic absorption bands of C-F stretching, aromatic ring and C=N stretching vibrations in the reflection-absorption FT-IR spectra. The surface amine density was reproducibly controlled as a function of deposition plasma power and quantified using UV-visible spectroscopy. A good linear correlation was observed between the FT-IR intensities of the characteristic absorption bands and the surface amine densities, suggesting the possibility of using this chemical derivatization technique to quantify the surface densities of specific functional groups on an organic surface. Chemical derivatization was also used with X-ray photoelectron spectroscopy on the same samples, and the results were compared with those obtained from FT-IR and time-of-flight secondary ion mass spectrometry. Although each analysis technique has different probing depths from the surface, the three different data sets obtained from the chemical tags correlated well with each other since each analysis technique measured the chemical tags on the sample surface.

  8. Preparation of Aligned Ultra-long and Diameter-controlled Silicon Oxide Nanotubes by Plasma Enhanced Chemical Vapor Deposition Using Electrospun PVP Nanofiber Template

    Directory of Open Access Journals (Sweden)

    Zhou Ming

    2009-01-01

    Full Text Available Abstract Well-aligned and suspended polyvinyl pyrrolidone (PVP nanofibers with 8 mm in length were obtained by electrospinning. Using the aligned suspended PVP nanofibers array as template, aligned ultra-long silicon oxide (SiOx nanotubes with very high aspect ratios have been prepared by plasma-enhanced chemical vapor deposition (PECVD process. The inner diameter (20–200 nm and wall thickness (12–90 nm of tubes were controlled, respectively, by baking the electrospun nanofibers and by coating time without sacrificing the orientation degree and the length of arrays. The micro-PL spectrum of SiOx nanotubes shows a strong blue–green emission with a peak at about 514 nm accompanied by two shoulders around 415 and 624 nm. The blue–green emission is caused by the defects in the nanotubes.

  9. Microwave Plasma Chemical Vapor Deposition of Nano-Structured Sn/C Composite Thin-Film Anodes for Li-ion Batteries

    Energy Technology Data Exchange (ETDEWEB)

    Stevenson, Cynthia; Marcinek, M.; Hardwick, L.J.; Richardson, T.J.; Song, X.; Kostecki, R.

    2008-02-01

    In this paper we report results of a novel synthesis method of thin-film composite Sn/C anodes for lithium batteries. Thin layers of graphitic carbon decorated with uniformly distributed Sn nanoparticles were synthesized from a solid organic precursor Sn(IV) tert-butoxide by a one step microwave plasma chemical vapor deposition (MPCVD). The thin-film Sn/C electrodes were electrochemically tested in lithium half cells and produced a reversible capacity of 440 and 297 mAhg{sup -1} at C/25 and 5C discharge rates, respectively. A long term cycling of the Sn/C nanocomposite anodes showed 40% capacity loss after 500 cycles at 1C rate.

  10. Deposition and Characterization of Nanocrystalline Diamond Films on Mirror-Polished Si Substrate by Biased Enhanced Microwave Plasma Chemical Vapor Deposition

    Science.gov (United States)

    Soga, T.; Sharda, T.; Jimbo, T.; Umeno, M.

    Hard and smooth nanocrystalline diamond (NCD) thin films were deposited on polished silicon substrates by biased enhanced growth in microwave plasma chemical vapor deposition. The films deposited with varying the methane concentration and biasing voltage were characterized by Raman spectroscopy, nano-indenter, x-ray diffraction and atomic force microscopy. Stress in the films increases with decreasing methane concentration in the gas-phase and with increasing biasing. The adhesion between NCD film and Si substrate is very strong sustaining the compressive stress as high as high as 85 GPa. It was hypothesized that hydrogen content of the films and graphitic content of the films are responsible in generating stress. The hardness is well correlated with the Raman peak intensity ratio of NCD peak to G peak.

  11. Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor

    Energy Technology Data Exchange (ETDEWEB)

    Dasgupta, Arup; Kuppusami, P.; Lawrence, Falix; Raghunathan, V.S.; Antony Premkumar, P.; Nagaraja, K.S

    2004-06-15

    A new technique has been developed for depositing hard nanocrystalline chromium nitride (CrN) thin films on metallic and ceramic substrates using plasma assisted metal-organic chemical vapor deposition (PAMOCVD) technique. In this low temperature and environment-friendly process, a volatile mixture of chromium(III) acetylacetonate and either ammonium iodide or ammonium bifluoride were used as precursors. Nitrogen and hydrogen have been used as the gas precursors. By optimizing the processing conditions, a maximum deposition rate of {approx}0.9 {mu}m/h was obtained. A comprehensive characterization of the CrN films was carried out using X-ray diffraction (XRD), microhardness, and microscopy. The microstructure of the CrN films deposited on well-polished stainless steel (SS) showed globular particles, while a relatively smooth surface morphology was observed for coatings deposited on polished yittria-stabilized zirconia (YSZ)

  12. Tensile test of a silicon microstructure fully coated with submicrometer-thick diamond like carbon film using plasma enhanced chemical vapor deposition method

    Science.gov (United States)

    Zhang, Wenlei; Uesugi, Akio; Hirai, Yoshikazu; Tsuchiya, Toshiyuki; Tabata, Osamu

    2017-06-01

    This paper reports the tensile properties of single-crystal silicon (SCS) microstructures fully coated with sub-micrometer thick diamond like carbon (DLC) film using plasma enhanced chemical vapor deposition (PECVD). To minimize the deformations or damages caused by non-uniform coating of DLC, which has high compression residual stress, released SCS specimens with the dimensions of 120 µm long, 4 µm wide, and 5 µm thick were coated from the top and bottom side simultaneously. The thickness of DLC coating is around 150 nm and three different bias voltages were used for deposition. The tensile strength improved from 13.4 to 53.5% with the increasing of negative bias voltage. In addition, the deviation in strength also reduced significantly compared to bare SCS sample.

  13. Effects of deposition parameters on microstructure and thermal conductivity of diamond films deposited by DC arc plasma jet chemical vapor deposition

    Institute of Scientific and Technical Information of China (English)

    QU Quan-yan; QIU Wan-qi; ZENG De-chang; LIU Zhong-wu; DAI Ming-jiang; ZHOU Ke-song

    2009-01-01

    The uniform diamond films with 60 mm in diameter were deposited by improved DC arc plasma jet chemical vapor deposition technique. The structure of the film was characterized by scanning electronic microcopy(SEM) and laser Raman spectrometry. The thermal conductivity was measured by a photo thermal deflection technique. The effects of main deposition parameters on microstructure and thermal conductivity of the films were investigated. The results show that high thermal conductivity, 10.0 W/(K-cm), can be obtained at a CH4 concentration of 1.5% (volume fraction) and the substrate temperatures of 880-920 ℃ due to the high density and high purity of the film. A low pressure difference between nozzle and vacuum chamber is also beneficial to the high thermal conductivity.

  14. Chemical bonding structural analysis of nitrogen-doped ultrananocrystalline diamond/hydrogenated amorphous carbon composite films prepared by coaxial arc plasma deposition

    Science.gov (United States)

    Gima, Hiroki; Zkria, Abdelrahman; Katamune, Yūki; Ohtani, Ryota; Koizumi, Satoshi; Yoshitake, Tsuyoshi

    2017-01-01

    Nitrogen-doped ultra-nanocrystalline diamond/hydrogenated amorphous carbon composite films prepared in hydrogen and nitrogen mixed-gas atmospheres by coaxial arc plasma deposition with graphite targets were studied electrically and chemical-bonding-structurally. The electrical conductivity was increased by nitrogen doping, accompanied by the production of n-type conduction. From X-ray photoemission, near-edge X-ray absorption fine-structure, hydrogen forward-scattering, and Fourier transform infrared spectral results, it is expected that hydrogen atoms that terminate diamond grain boundaries will be partially replaced by nitrogen atoms and, consequently, π C–N and C=N bonds that easily generate free electrons will be formed at grain boundaries.

  15. Effect of residual stresses on the strength, adhesion and wear resistance of SiC coatings obtained by plasma-enhanced chemical vapor deposition on low alloy steel

    Energy Technology Data Exchange (ETDEWEB)

    Kattamis, T.Z. (Department of Metallurgy, Institute of Materials Science, University of Connecticut, Storrs, CT 06269-3136 (United States)); Chen, M. (Department of Metallurgy, Institute of Materials Science, University of Connecticut, Storrs, CT 06269-3136 (United States)); Skolianos, S. (Aristoteles University, Thessaloniki (Greece)); Chambers, B.V. (Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139 (United States))

    1994-11-01

    Amorphous hydrogenated silicon carbide thin coatings were deposited on AISI 4340 low alloy steel wafers and thicker steel specimens by plasma-enhanced chemical vapor deposition. The cohesion of the coating, its adhesion to the substrate and its friction coefficient were evaluated by automatic scratch testing, and its wear resistance by pin-on-disk tribometry. During annealing, the residual stress attributed to hydrogen entrapment during deposition gradually changed from compressive to tensile and its rate of increase decreased with increasing annealing time. The cohesion and adhesion failure loads and the abrasive wear resistance decreased with decreasing residual compressive stress and increasing residual tensile stress. The friction coefficient between the coating surface and a diamond stylus decreased with increasing annealing time. ((orig.))

  16. Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. power

    Energy Technology Data Exchange (ETDEWEB)

    Rashid, Nur Maisarah Abdul, E-mail: nurmaisarahrashid@gmail.com [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Ritikos, Richard; Othman, Maisara; Khanis, Noor Hamizah; Gani, Siti Meriam Ab. [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Muhamad, Muhamad Rasat [Chancellery Office, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Rahman, Saadah Abdul, E-mail: saadah@um.edu.my [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Chancellery Office, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)

    2013-02-01

    Silicon carbon films were deposited using a hybrid radio frequency (r.f.) plasma enhanced chemical vapor deposition (PECVD)/sputtering deposition system at different r.f. powers. This deposition system combines the advantages of r.f. PECVD and sputtering techniques for the deposition of silicon carbon films with the added advantage of eliminating the use of highly toxic silane gas in the deposition process. Silicon (Si) atoms were sputtered from a pure amorphous silicon (a-Si) target by argon (Ar) ions and carbon (C) atoms were incorporated into the film from C based growth radicals generated through the discharge of methane (CH{sub 4}) gas. The effects of r.f. powers of 60, 80, 100, 120 and 150 W applied during the deposition process on the structural and optical properties of the films were investigated. Raman spectroscopic studies showed that the silicon carbon films contain amorphous silicon carbide (SiC) and amorphous carbon (a-C) phases. The r.f. power showed significant influence on the C incorporation in the film structure. The a-C phases became more ordered in films with high C incorporation in the film structure. These films also produced high photoluminescence emission intensity at around 600 nm wavelength as a result of quantum confinement effects from the presence of sp{sup 2} C clusters embedded in the a-SiC and a-C phases in the films. - Highlights: ► Effects of radio frequency (r.f.) power on silicon carbon (SiC) films were studied. ► Hybrid plasma enhanced chemical vapor deposition/sputtering technique was used. ► r.f. power influences C incorporation in the film structure. ► High C incorporation results in higher ordering of the amorphous C phase. ► These films produced high photoluminescence emission intensity.

  17. Morphological and optical properties changes in nanocrystalline Si (nc-Si) deposited on porous aluminum nanostructures by plasma enhanced chemical vapor deposition for Solar energy applications

    Energy Technology Data Exchange (ETDEWEB)

    Ghrib, M., E-mail: mondherghrib@yahoo.fr [Laboratoire de Photovoltaique (L.P.V.), Centre de Recherche et des Technologies de l' Energie, BP 95, Hammam-Lif 2050 (Tunisia); Gaidi, M.; Ghrib, T.; Khedher, N. [Laboratoire de Photovoltaique (L.P.V.), Centre de Recherche et des Technologies de l' Energie, BP 95, Hammam-Lif 2050 (Tunisia); Ben Salam, M. [L3M, Department of Physics, Faculty of Sciences of Bizerte, 7021 Zarzouna (Tunisia); Ezzaouia, H. [Laboratoire de Photovoltaique (L.P.V.), Centre de Recherche et des Technologies de l' Energie, BP 95, Hammam-Lif 2050 (Tunisia)

    2011-08-15

    Photoluminescence (PL) spectroscopy was used to determine the electrical band gap of nanocrystalline silicon (nc-Si) deposited by plasma enhancement chemical vapor deposition (PECVD) on porous alumina structure by fitting the experimental spectra using a model based on the quantum confinement of electrons in Si nanocrystallites having spherical and cylindrical forms. This model permits to correlate the PL spectra to the microstructure of the porous aluminum silicon layer (PASL) structure. The microstructure of aluminum surface layer and nc-Si films was systematically studied by atomic force microscopy (AFM), transmission electron microscopy (TEM), Raman spectroscopy and X-ray diffraction (XRD). It was found that the structure of the nanocrystalline silicon layer (NSL) is dependent of the porosity (void) of the porous alumina layer (PAL) substrate. This structure was performed in two steps, namely the PAL substrate was prepared using sulfuric acid solution attack on an Al foil and then the silicon was deposited by plasma enhanced chemical vapor deposition (PECVD) on it. The optical constants (n and k as a function of wavelength) of the deposited films were obtained using variable angle spectroscopic ellipsometry (SE) in the UV-vis-NIR regions. The SE spectrum of the porous aluminum silicon layer (PASL) was modeled as a mixture of void, crystalline silicon and aluminum using the Cauchy model approximation. The specific surface area (SSA) was estimated and was found to decrease linearly when porosity increases. Based on this full characterization, it is demonstrated that the optical characteristics of the films are directly correlated to their micro-structural properties.

  18. Impact of In doping on GeTe phase-change materials thin films obtained by means of an innovative plasma enhanced metalorganic chemical vapor deposition process

    Science.gov (United States)

    Szkutnik, P. D.; Aoukar, M.; Todorova, V.; Angélidès, L.; Pelissier, B.; Jourde, D.; Michallon, P.; Vallée, C.; Noé, P.

    2017-03-01

    We investigated the deposition and the phase-change properties of In-doped GeTe thin films obtained by plasma enhanced metalorganic chemical vapor deposition and doped with indium using a solid delivery system. The sublimated indium precursor flow rate was calculated as a function of sublimation and deposition parameters. Indium related optical emission recorded by means of optical emission spectroscopy during deposition plasma allowed proposing the dissociation mechanisms of the [In(CH3)2N(CH3)2]2 solid precursor. In particular, using an Ar + H2 + NH3 deposition plasma, sublimated indium molecules are completely dissociated and do not induce by-product contamination by addition of nitrogen or carbon in the films. X-ray photoelectron spectroscopy evidences the formation of In-Te bonds in amorphous as-deposited In-doped GeTe films. The formation of an InTe phase after 400 °C annealing is also evidenced by means of X-ray diffraction analysis. The crystallization temperature Tx, deduced from monitoring of optical reflectivity of In-doped GeTe films with doping up to 11 at. % slightly varies as a function of the In dopant level with a decrease of Tx down to a minimum value for an In doping level of about 6-8 at. %. In this In doping range, the structure of crystallized In-GeTe films changes and is dominated by the presence of a crystalline In2Te3 phase. Finally, the Kissinger activation energy for crystallization Ea is showing to monotonically decrease as the indium content in the GeTe film is increased indicating a promising effect of In doping on crystallization speed in memory devices while keeping a good thermal stability for data retention.

  19. Determination of Glucosamine in Human Plasma by High-Performance Liquid Chromatography-Atmospheric Pressure Chemical Ionization Source-Tandem Mass Spectrometry

    Directory of Open Access Journals (Sweden)

    Xingchen Zhou

    2011-01-01

    Full Text Available A sensitive, specific, and rapid high-performance liquid chromatography-atmospheric pressure chemical ionization source-tandem mass spectrometry (HPLC-APCI-MS/MS method for the determination of glucosamine in human plasma was developed and validated. Plasma samples were processed by protein precipitation with dehydrated ethanol, and the chromatographic separation was performed on an Agilent XDB-C18 column with a mobile phase of methanol—0.2% formic acid solution (70 : 30, v/v. Mass spectrometric quantification was carried out in the multiple reaction monitoring (MRM mode, monitoring ion transitions of m/z 180.1 to m/z 162.1 with collision energy (CE of 2 eV for glucosamine and m/z 181.1 to m/z 163.1 with CE of 2 eV for the internal standard (IS in positive ion mode. The linear calibration curves covered a concentration range of 53.27–3409 ng/mL with a lower limit of quantification (LLOQ of 53.27 ng/mL. The extraction recovery of glucosamine was greater than 101.7%. The intra- and interday precisions for glucosamine were less than 10%, and the accuracies were between 93.7% and 102.6%, determined from quality control (QC samples of three representative concentrations. The method has been successfully applied to determining the plasma concentration of glucosamine in a clinical pharmacokinetic study involving 20 healthy Chinese male volunteers.

  20. Characterization of Plasma Enhanced Chemical Vapor Deposition-Physical Vapor Deposition transparent deposits on textiles to trigger various antimicrobial properties to food industry textiles

    Energy Technology Data Exchange (ETDEWEB)

    Brunon, Celine [Universite de Lyon, Universite Lyon 1, Laboratoire des Sciences Analytiques (LSA), CNRS, UMR 5180, Bat. J. Raulin 5eme etage, F-69622 Villeurbanne Cedex (France); Chadeau, Elise; Oulahal, Nadia [Universite de Lyon, Universite Lyon 1, Laboratoire de Recherche en Genie Industriel Alimentaire (LRGIA, E.A. 3733), Rue Henri de Boissieu, F-01000 Bourg en Bresse (France); Grossiord, Carol [Science et Surface, 64, Chemin des Mouilles, F-69130 Ecully (France); Dubost, Laurent [HEF, ZI SUD, Rue Benoit Fourneyron, F-42166 Andrezieux Boutheon (France); Bessueille, Francois [Universite de Lyon, Universite Lyon 1, Laboratoire des Sciences Analytiques (LSA), CNRS, UMR 5180, Bat. J. Raulin 5eme etage, F-69622 Villeurbanne Cedex (France); Simon, Farida [TDV Industrie, 43 Rue du Bas des Bois, BP 121, F-53012 Laval Cedex (France); Degraeve, Pascal [Universite de Lyon, Universite Lyon 1, Laboratoire de Recherche en Genie Industriel Alimentaire (LRGIA, E.A. 3733), Rue Henri de Boissieu, F-01000 Bourg en Bresse (France); Leonard, Didier, E-mail: didier.leonard@univ-lyon1.fr [Universite de Lyon, Universite Lyon 1, Laboratoire des Sciences Analytiques (LSA), CNRS, UMR 5180, Bat. J. Raulin 5eme etage, F-69622 Villeurbanne Cedex (France)

    2011-07-01

    Textiles for the food industry were treated with an original deposition technique based on a combination of Plasma Enhanced Chemical Vapor Deposition and Physical Vapor Deposition to obtain nanometer size silver clusters incorporated into a SiOCH matrix. The optimization of plasma deposition parameters (gas mixture, pressure, and power) was focused on textile transparency and antimicrobial properties and was based on the study of both surface and depth composition (X-ray Photoelectron Spectroscopy (XPS), Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS), as well as Transmission Electron Microscopy, Atomic Force Microscopy, SIMS depth profiling and XPS depth profiling on treated glass slides). Deposition conditions were identified in order to obtain a variable and controlled quantity of {approx} 10 nm size silver particles at the surface and inside of coatings exhibiting acceptable transparency properties. Microbiological characterization indicated that the surface variable silver content as calculated from XPS and ToF-SIMS data directly influences the level of antimicrobial activity.

  1. Properties of silicon nitride thin overlays deposited on optical fibers — Effect of fiber suspension in radio frequency plasma-enhanced chemical vapor deposition reactor

    Energy Technology Data Exchange (ETDEWEB)

    Śmietana, M., E-mail: M.Smietana@elka.pw.edu.pl [Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Koszykowa 75, Warsaw 00-662 (Poland); Dominik, M.; Myśliwiec, M.; Kwietniewski, N. [Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Koszykowa 75, Warsaw 00-662 (Poland); Mikulic, P. [Centre de Recherche en Photonique, Université du Québec en Outaouais, 101 rue Saint-Jean-Bosco, Gatineau, J8X 3X7, Québec (Canada); Witkowski, B.S. [Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, Warsaw 02-666 (Poland); Bock, W.J. [Centre de Recherche en Photonique, Université du Québec en Outaouais, 101 rue Saint-Jean-Bosco, Gatineau, J8X 3X7, Québec (Canada)

    2016-03-31

    This work discusses the effect of sample suspension in radio frequency plasma-enhanced chemical vapor deposition process on properties of the obtained overlays. Silicon nitride (SiN{sub x}) overlays were deposited on flat silicon wafers and cylindrical fused silica optical fibers. The influence of the suspension height and fiber diameter on SiN{sub x} deposition rate is investigated. It has been found that thickness of the SiN{sub x} overlay significantly increases with suspension height, and the deposition rate depends on fiber dimensions. Moreover, the SiN{sub x} overlays were also deposited on long-period gratings (LPGs) induced in optical fiber. Measurements of the LPG spectral response combined with its numerical simulations allowed for a discussion on properties of the deposited overlay. The measurements have proven higher overlay deposition rate on the suspended fiber than on flat Si wafer placed on the electrode. Results of this work are essential for precise tuning of the functional properties of new generations of optical devices such as optical sensors, filters and resonators, which typically are based on optical fibers and require the overlays with well defined properties. - Highlights: • The effect of optical fiber suspension in plasma process is discussed. • The deposition rate of silicon nitride (SiN{sub x}) overlay depends on fiber dimensions. • Thickness of the SiN{sub x} overlay strongly increases with suspension height. • Measurements and simulations of long-period grating confirms experimental results.

  2. Performance Improvement of Microcrystalline p-SiC/i-Si/n-Si Thin Film Solar Cells by Using Laser-Assisted Plasma Enhanced Chemical Vapor Deposition

    Directory of Open Access Journals (Sweden)

    Hsin-Ying Lee

    2014-01-01

    Full Text Available The microcrystalline p-SiC/i-Si/n-Si thin film solar cells treated with hydrogen plasma were fabricated at low temperature using a CO2 laser-assisted plasma enhanced chemical vapor deposition (LAPECVD system. According to the micro-Raman results, the i-Si films shifted from 482 cm−1 to 512 cm−1 as the assisting laser power increased from 0 W to 80 W, which indicated a gradual transformation from amorphous to crystalline Si. From X-ray diffraction (XRD results, the microcrystalline i-Si films with (111, (220, and (311 diffraction were obtained. Compared with the Si-based thin film solar cells deposited without laser assistance, the short-circuit current density and the power conversion efficiency of the solar cells with assisting laser power of 80 W were improved from 14.38 mA/cm2 to 18.16 mA/cm2 and from 6.89% to 8.58%, respectively.

  3. Characterization of the SiO2 film deposited by using plasma enhanced chemical vapor deposition (PECVD with TEOS/N2/O2

    Directory of Open Access Journals (Sweden)

    Meysam Zarchi

    2013-12-01

    Full Text Available The purpose of this study was to examine how certain parameters like temperature, pressure, and gas composition affect the characteristics of SiO2 film by Plasma Enhanced Chemical Vapor Deposition (PECVD. We used of low temperature and an inductively coupled plasma (ICP for various with gas mixtures of TEOS/N2/O2 at a given RF power and dc bias voltage. For the gas mixture with 40 sccm of N2 in TEOS, 100 standard cubic centimeters per minute (sccm of N2, and 500 sccm of O2, transparent and scratch-resistant SiO2 could be deposited with a deposition rate of 30 nm/min when RF power of 500 W and a dc-bias voltage of 350V were applied. The characteristics of the deposited SiO2, such as the composition, the binding energy, etc. were compared with the SiO2 deposited by using thermal CVD and evaporation. It was found that the SiO2 deposited by PECVD with TEOS/N2/O2 exhibited properties typical of SiO2 deposited applying thermal CVD and evaporation. The surface roughness of the 100 nm-thick SiO2 deposited by PECVD was similar to that of the substrate.

  4. Porous Silicon & Titanium Dioxide Coatings Prepared by Atmospheric Pressure Plasma Jet Chemical Vapour Deposition Technique-A Novel Coating Technology for Photovoltaic Modules

    Directory of Open Access Journals (Sweden)

    S. Bhatt

    2011-01-01

    Full Text Available Atmospheric Pressure Plasma Jet (APPJ is an alternative for wet processes used to make anti reflection coatings and smooth substrate surface for the PV module. It is also an attractive technique because of it’s high growth rate, low power consumption, lower cost and absence of high cost vacuum systems. This work deals with the deposition of silicon oxide from hexamethyldisiloxane (HMDSO thin films and titanium dioxide from tetraisopropyl ortho titanate using an atmospheric pressure plasma jet (APPJ system in open air conditions. A sinusoidal high voltage with a frequency between 19-23 kHz at power up to 1000 W was applied between two tubular electrodes separated by a dielectric material. The jet, characterized by Tg ~ 600-800 K, was mostly laminar (Re ~ 1200 at the nozzle exit and became partially turbulent along the jet axis (Re ~ 3300. The spatially resolved emission spectra showed OH, N2, N2+ and CN molecular bands and O, H, N, Cu and Cr lines as well as the NO2 chemiluminescence continuum (450-800 nm. Thin films with good uniformity on the substrate were obtained at high deposition rate, between 800 -1000 nm.s-1, and AFM results revealed that coatings are relatively smooth (Ra ~ 2 nm. The FTIR and SEM analyses were better used to monitor the chemical composition and the morphology of the films in function of the different experimental conditions.

  5. Mechanical and Chemical Characterization of a TiC/C System Synthesized Using a Focus Plasma Arc.

    Directory of Open Access Journals (Sweden)

    Reza Mahmoodian

    Full Text Available Titanium carbide-graphite (TiC/C composite was successfully synthesized from Ti and C starting elemental powders using self-propagating high-temperature synthesis technique in an ultra-high plasma inert medium in a single stage. The TiC was exposed to a high-temperature inert medium to allow recrystallization. The product was then characterized using field emission scanning electron microscopy (FESEM coupled with energy dispersive X-ray analysis (EDX, X-ray diffraction (XRD, Rietveld refinement, nanoindentation, and micro-hardness to determine the product's properties. The recorded micro-hardness of the product was 3660 HV, which is a 14% enhancement and makes is comparable to TiC materials.

  6. Blood plasma clinical-chemical parameters as biomarker endpoints for organohalogen contaminant exposure in Norwegian raptor nestlings

    DEFF Research Database (Denmark)

    Sonne, Christian; Bustnes, Jan O.; Herzke, Dorte;

    2012-01-01

    ), golden eagle (n=12) and white-tailed eagle (n=36) nestlings during three consecutive breeding seasons. We found that blood plasma concentrations of calcium, sodium, creatinine, cholesterol, albumin, total protein, urea, inorganic phosphate, protein:creatinine, urea:creatinine and uric acid...... were also negatively correlated to PCBs and PFCs, respectively. The most significant relationships were found for the highly contaminated northern goshawks and white-tailed eagles. The statistical relationships between OHCs and BCCPs indicate that biochemical pathways could be influenced while...... it is uncertain if such changes have any health effects. The OHC concentrations were below concentrations causing reproductive toxicity in adults of other raptor species but similar to those of concern for endocrine disruption of thyroid hormones in e.g., bald eagles....

  7. Direct Fabrication of Carbon Nanotubes STM Tips by Liquid Catalyst-Assisted Microwave Plasma-Enhanced Chemical Vapor Deposition

    Directory of Open Access Journals (Sweden)

    Fa-Kuei Tung

    2009-01-01

    Full Text Available Direct and facile method to make carbon nanotube (CNT tips for scanning tunneling microscopy (STM is presented. Cobalt (Co particles, as catalysts, are electrochemically deposited on the apex of tungsten (W STM tip for CNT growth. It is found that the quantity of Co particles is well controlled by applied DC voltage, concentration of catalyst solution, and deposition time. Using optimum growth condition, CNTs are successfully synthesized on the tip apex by catalyst-assisted microwave-enhanced chemical vapor deposition (CA-MPECVD. A HOPG surface is clearly observed at an atomic scale using the present CNT-STM tip.

  8. Modeling of Flowing Plasmas and Pulse Power Schemes for O2(1Delta) Production for Chemical Lasers

    Science.gov (United States)

    2008-01-19

    Redistribution subject to AlP license or copyright, see http:l/jap.aip.org/jap/copyright.jsp 113306-11 Babaeva, Arakoni, and Kushner J. Appi . Phys. 99...Babaeva, and M. J. Kushner, J. Appl. ’W. E. McDermott, N R. Pchelkin, D. J. Benard. and R. R. Bousek, AppI . Phys. 98. 073304 (2t005). Phys. Lett. 32. 469...8217A. Elior, B. D. Barm,tsheniko, E. Lebiush, and S. Rosenwaks. AppI . Phys. Gas Flost and Chemical Las,ers and lligh Power Laser Conference tyro- B

  9. Effects of boron addition on a-Si{sub 90}Ge{sub 10}:H films obtained by low frequency plasma enhanced chemical vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Perez, Arllene M [Instituto Nacional de Astrofisica, Optica y Electronica (INAOE), Luis E Erro no. 1, Santa Maria Tonantzintla, CP 72840, Puebla, Puebla (Mexico); Universidad Popular Autonoma del Estado de Puebla (UPAEP), 21 Sur 1103 Colonia Santiago, CP 72160, Puebla, Puebla (Mexico); Renero, Francisco J [Instituto Nacional de Astrofisica, Optica y Electronica (INAOE), Luis E Erro no. 1, Santa Maria Tonantzintla, CP 72840, Puebla, Puebla (Mexico); Zuniga, Carlos [Instituto Nacional de AstrofIsica, Optica y Electronica (INAOE), Luis E Erro no. 1, Santa MarIa Tonantzintla, CP 72840, Puebla, Puebla (Mexico); Torres, Alfonso [Instituto Nacional de Astrofisica, Optica y Electronica (INAOE), Luis E Erro no. 1, Santa MarIa Tonantzintla, CP 72840, Puebla, Puebla (Mexico); Santiago, Cesar [Universidad Politecnica de Tulancingo, Prolongacion Guerrero 808 Colonia Caltengo, CP 43626, Tulancingo, Hidalgo (Mexico)

    2005-06-29

    Optical, structural and electric properties of (a-(Si{sub 90}Ge{sub 10}){sub 1-y}B{sub y}:H) thin film alloys, deposited by low frequency plasma enhanced chemical vapour deposition, are presented. The chemical bonding structure has been studied by IR spectroscopy, while the composition was investigated by Raman spectroscopy. A discussion about boron doping effects, in the composition and bonding of samples, is presented. Transport of carriers has been studied by measurement of the conductivity dependence on temperature, which increases from 10{sup -3} to 10{sup 1} {omega}{sup -1} cm{sup -1} when the boron content varies from 0 to 50%. Similarly, the activation energy is between 0.62 and 0.19 eV when the doping increases from 0 to 83%. The optical properties have been determined from the film's optical transmission, using Swanepoel's method. It is shown that the optical gap varies from 1.3 to 0.99 eV.

  10. Direct quantification of chemical warfare agents and related compounds at low ppt levels: comparing active capillary dielectric barrier discharge plasma ionization and secondary electrospray ionization mass spectrometry.

    Science.gov (United States)

    Wolf, Jan-Christoph; Schaer, Martin; Siegenthaler, Peter; Zenobi, Renato

    2015-01-06

    A novel active capillary dielectric barrier discharge plasma ionization (DBDI) technique for mass spectrometry is applied to the direct detection of 13 chemical warfare related compounds, including sarin, and compared to secondary electrospray ionization (SESI) in terms of selectivity and sensitivity. The investigated compounds include an intact chemical warfare agent and structurally related molecules, hydrolysis products and/or precursors of highly toxic nerve agents (G-series, V-series, and "new" nerve agents), and blistering and incapacitating warfare agents. Well-defined analyte gas phase concentrations were generated by a pressure-assisted nanospray with consecutive thermal evaporation and dilution. Identification was achieved by selected reaction monitoring (SRM). The most abundant fragment ion intensity of each compound was used for quantification. For DBDI and SESI, absolute gas phase detection limits in the low ppt range (in MS/MS mode) were achieved for all compounds investigated. Although the sensitivity of both methods was comparable, the active capillary DBDI sensitivity was found to be dependent on the applied AC voltage, thus enabling direct tuning of the sensitivity and the in-source fragmentation, which may become a key feature in terms of field applicability. Our findings underline the applicability of DBDI and SESI for the direct, sensitive detection and quantification of several CWA types and their degradation products. Furthermore, they suggest the use of DBDI in combination with hand-held instruments for CWAs on-site monitoring.

  11. Determination of Se in biological samples by axial view inductively coupled plasma optical emission spectrometry after digestion with aqua regia and on-line chemical vapor generation

    Energy Technology Data Exchange (ETDEWEB)

    Santos, Eder Jose dos [Instituto de Tecnologia do Parana (TECPAR), 81350-010 Curitiba, PR (Brazil)], E-mail: eder@tecpar.br; Herrmann, Amanda Beatriz; Kulik de Caires, Suzete [Instituto de Tecnologia do Parana (TECPAR), 81350-010 Curitiba, PR (Brazil); Azzolin Frescura, Vera Lucia; Curtius, Adilson Jose [Departamento de Quimica, Universidade Federal de Santa Catarina (UFSC), 880400-900 Florianopolis, SC (Brazil)

    2009-06-15

    A simple and fast method for the determination of Se in biological samples, including food, by axial view inductively coupled plasma optical emission spectrometry using on-line chemical vapor generation (CVG-ICP OES) is proposed. The concentrations of HCl and NaBH{sub 4}, used in the chemical vapor generation were optimized by factorial analysis. Six certified materials (non-fat milk powder, lobster hepatopancreas, human hair, whole egg powder, oyster tissue, and lyophilised pig kidney) were treated with 10 mL of aqua regia in a microwave system under reflux for 15 min followed by additional 15 min in an ultrasonic bath. The solutions were transferred to a 100 mL volumetric flask and the final volume was made up with water. The Se was determined directly in these solutions by CVG-ICP OES, using the analytical line at 196.026 nm. Calibration against aqueous standards in 10% v/v aqua regia in the concentration range of 0.5-10.0 {mu}g L{sup -} {sup 1} Se(IV) was used for the analysis. The quantification limit, considering a 0.5 g sample weight in a final volume of 100 mL{sup -} {sup 1} was 0.10 {mu}g g{sup -} {sup 1}. The obtained concentration values were in agreement with the total certified concentrations, according to the t-test for a 95% confidence level.

  12. Chemical speciation studies on DU contaminated soils using flow field flow fractionation linked to inductively coupled plasma mass spectrometry (FlFFF-ICP-MS).

    Science.gov (United States)

    Brittain, S R; Cox, A G; Tomos, A D; Paterson, E; Siripinyanond, A; McLeod, C W

    2012-03-01

    Flow field flow fractionation (FlFFF) in combination with inductively coupled plasma mass spectrometry (ICP-MS) was used to study the chemical speciation of U and trace metals in depleted uranium (DU) contaminated soils. A chemical extraction procedure using sodium pyrophosphate, followed by isolation of humic and fulvic substances was applied to two dissimilar DU contaminated sample types (a sandy soil and a clay-rich soil), in addition to a control soil. The sodium pyrophosphate fractions of the firing range soils (Eskmeals and Kirkcudbright) were found to contain over 50% of the total U (measured after aqua regia digestion), compared to approximately 10% for the control soil. This implies that the soils from the contaminated sites contained a large proportion of the U within more easily mobile soil fractions. Humic and fulvic acid fractions each gave characteristic peak maxima for analytes of interest (Mn, Fe, Cu, Zn, Pb and U), with the fulvic acid fraction eluting at a smaller diameter (approximately 2.1 nm on average) than the humic fraction (approximately 2.4 nm on average). DU in the fulvic acid fraction gave a bimodal peak, not apparent for other trace elements investigated, including natural U. This implies that DU interacts with the fulvic acid fraction in a different way to all other elements studied. This journal is © The Royal Society of Chemistry 2012

  13. CLOSURE OF SMALL CENTRAL PERFORATIONS OF TYMPANIC MEMBRANE WITH GELFILM PATCH AND APPLICATION OF PLATELET RICH PLASMA VERSUS CHEMICAL CAUTERIZATION: A COMPARATIVE STUDY

    Directory of Open Access Journals (Sweden)

    Jeena Kunnathully

    2016-03-01

    Full Text Available BACKGROUND Small central perforation of tympanic membrane is a common finding in patients approaching Otolaryngologists. Even though tympanoplasty can provide a disease free ear and restore hearing loss, most of these cases are either left alone or not surgically treated due to lack of patient compliance. OBJECTIVES In the present study conducted in the Department of Otolaryngology and Head and Neck Surgery, Academy of Medical Sciences, Pariyaram, Kerala, India, we have compared the results of two office procedures for closure of small central perforations. STUDY DESIGN Randomised control trial. METHODS Out of 35 cases with small central perforations of tympanic membrane, 18 were subjected to chemical cauterization with Gelfoam patching and 17 underwent freshening with application of Gelfilm patch and Platelet Rich Plasma (PRP. RESULTS Results were measured in terms of healing of perforation and hearing gain at the end of 3 months. Complete closure was achieved in 54% for chemical cauterization and 53% for Gelfilm patching. The mean hearing gain was 2.17 dB and 2.29 dB respectively. CONCLUSION Smaller size, traumatic aetiology and antero-inferior locations of tympanic membrane perforation showed better results, whereas larger perforations, comorbidities like diabetes mellitus and posteroinferior locations showed poorer results. The complications noted were vertigo, more in chemical cauterization group and otomycosis, more in the freshening and Gelfilm patching group. We thus conclude that all cases of dry small central perforations should be given a trial of either of these cost effective nonsurgical methods before resorting to surgery, depending upon patient compliance.

  14. Multiple node remote messaging

    Energy Technology Data Exchange (ETDEWEB)

    Blumrich, Matthias A. (Ridgefield, CT); Chen, Dong (Croton on Hudson, NY); Gara, Alan G. (Mount Kisco, NY); Giampapa, Mark E. (Irvington, NY); Heidelberger, Philip (Cortlandt Manor, NY); Ohmacht, Martin (Yorktown Heights, NY); Salapura, Valentina (Chappaqua, NY); Steinmacher-Burow, Burkhard (Esslingen, DE); Vranas, Pavlos (Danville, CA)

    2010-08-31

    A method for passing remote messages in a parallel computer system formed as a network of interconnected compute nodes includes that a first compute node (A) sends a single remote message to a remote second compute node (B) in order to control the remote second compute node (B) to send at least one remote message. The method includes various steps including controlling a DMA engine at first compute node (A) to prepare the single remote message to include a first message descriptor and at least one remote message descriptor for controlling the remote second compute node (B) to send at least one remote message, including putting the first message descriptor into an injection FIFO at the first compute node (A) and sending the single remote message and the at least one remote message descriptor to the second compute node (B).

  15. Speciation analysis of mercury in cereals by liquid chromatography chemical vapor generation inductively coupled plasma-mass spectrometry.

    Science.gov (United States)

    Lin, Liang-Yen; Chang, Lan-Fang; Jiang, Shiuh-Jen

    2008-08-27

    A simple and rapid procedure for the separation and determination of inorganic, methyl, and ethyl mercury compounds was described using liquid chromatography (LC) followed by vapor generation inductively coupled plasma-mass spectrometry (VG-ICP-MS). Well resolved chromatograms were obtained within 5 min by reversed-phase liquid chromatography with a C8 column as the stationary phase and a pH 4.7 solution containing 0.5% v/v 2-mercaptoethanol and 5% v/v methanol as the mobile phase. The separated mercury compounds were converted to mercury vapors by an in situ nebulizer/vapor generation system for their introduction into ICP. The concentrations of NaBH4 and HNO3 required for vapor generation were also optimized. The method was applied for the speciation of mercury in reference materials NIST SRM 1568a Rice Flour and NIST SRM 1567a Wheat Flour and also rice flour and wheat flour samples purchased locally. The accuracy of the procedure was verified by analyzing the certified reference material NRCC DOLT-3 Dogfish Liver for methyl mercury. Precision between sample replicates was better than 13% for all the determinations. The detection limits of the mercury compounds studied were in the range 0.003-0.006 ng Hg mL(-1) in the injected solutions, which correspond to 0.02-0.06 ng g(-1) in original flour samples. A microwave-assisted extraction procedure was adopted for the extraction of mercury compounds from rice flour, wheat flour, and fish samples using a mobile phase solution.

  16. Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Bo-Heng [Instrument Technology Research Center, National Applied Research Laboratories, Taiwan (China); Huang, Hung Ji, E-mail: hjhuang@itrc.narl.org.tw [Instrument Technology Research Center, National Applied Research Laboratories, Taiwan (China); Huang, Sheng-Hsin [Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 300, Taiwan (China); Hsiao, Chien-Nan [Instrument Technology Research Center, National Applied Research Laboratories, Taiwan (China)

    2014-09-01

    The inductively coupled plasma-enhanced atomic layer deposition (PEALD) method was used to fabricate ultrathin and smooth Pt thin films at low temperatures without the use of a Pt seed layer. The Pt thin metal films deposited at 200 °C onto Si and glass substrates exhibited high conductivities (< 12 μΩ cm for films with a thickness greater than 8 nm) and thermal stabilities resembling those of the bulk material. The measured density of the deposited Pt thin films was 20.7 ± 6 g/cm{sup 3}. X-ray photoelectron spectra of the films showed clear 4f peaks (74.3 eV (4f{sub 5/2}) and 71.1 eV (4f{sub 7/2})), and X-ray diffraction measurements showed the (111) peak of the fcc structure. The deposited Pt layers were in crystal form. The 25.5-nm Pt films coated onto 170-nm-wide trench structures (aspect ratio of 3.5:1) exhibited good step coverage. The PEALD-deposited Pt thin films were chemically stable under high-temperature light illumination and could serve as catalysts under strongly alkaline conditions (pH = 12) during the long-term oxidization of ammonium ions. - Highlights: • Inductively coupled plasma applied to enhance atomic layer deposition (PEALD) • Smooth Pt films fabricated by PEALD at low temperature • 8-nm Pt shows clear metal peaks in XPS and XRD. • 8-nm Pt shows low electrical resistivity of 16 μΩ cm. • 8-nm Pt shows stability under strong light and pH = 12 wash by NH{sub 4}{sup +}/NaOH solution.

  17. Synthesis of chemically-modified single-walled carbon nanotubes by counter-current ammonia gas injection into the induction thermal plasma process

    Science.gov (United States)

    Shahverdi, Ali

    Pristine single-walled carbon nanotubes (SWCNTs) are poorly dispersible and insoluble in many solvents and need to be chemically modified prior to their use in many applications. This work is focused on the investigation of the synthesis of chemically modified SWCNTs material through an in situ approach. The main objectives of the presented research are: 1) to explore the in situ chemical process during the synthesis of SWCNT and 2) to closely examine the effect of a reactive environment on SWCNTs. Effects of the catalyst type and content on the SWCNTs final product, synthesized by induction thermal plasma (ITP), were studied to replace toxic cobalt (Co) in the feedstock. In this regard, three different catalyst mixtures (i.e. Ni-Y2O3, Ni-Co-Y2O3, and Ni-Mo-Y2O3) were used. Experimental results showed that the catalyst type affects the quality of the SWCNT final product. Similar quality SWCNTs can be produced when the same amount of Co was replaced by Ni. Moreover, the results observed in this experimental work were further explained by thermodynamic calculation results. Thermogravimetry (TG) was used throughout the work to characterize the SWCNTs product. TG was firstly standardized by studying the effects of three main instrumental parameters (temperature ramp, TR, initial mass of the sample, IM, and gas flow rate, FR) on the Tonset and full-width half maximum (FWHM) obtained from TG and derivative TG graphs of carbon black, respectively. Therefore, a two-level factorial statistical design was performed. The statistical analysis showed that the effect of TR, IM, and to a lower extent, FR, is significant on FWHM and insignificant on Tonset. A methodology was then developed based upon the SWCNTs synthesis using the ITP system, through an in situ chemistry approach. Ammonia (NH3) was selected and counter-currently injected into the ITP reactor at three different flow rates and by four different nozzle designs. Numerical simulation indicated a better mixing of NH3 in

  18. Nonthermal plasma chemistry and physics

    CERN Document Server

    Meichsner, Jurgen; Schneider, Ralf; Wagner, Hans-Erich

    2013-01-01

    In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications.Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemist

  19. Effect of nickel oxide seed layers on annealed-amorphous titanium oxide thin films prepared using plasma-enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Wu, Cheng-Yang; Hong, Shao-Chyang [Institute of Electro-Optical and Materials Science, National Formosa University, Huwei, Yunlin, 63201, Taiwan (China); Hwang, Fu-Tsai [Department of Electro-Optical Engineering, National United University, Miao-Li, 36003, Taiwan (China); Lai, Li-Wen [ITRI South, Industrial Technology Research Institute, Liujia, Tainan, 73445, Taiwan (China); Lin, Tan-Wei [Institute of Electro-Optical and Materials Science, National Formosa University, Huwei, Yunlin, 63201, Taiwan (China); Liu, Day-Shan, E-mail: dsliu@sunws.nfu.edu.tw [Institute of Electro-Optical and Materials Science, National Formosa University, Huwei, Yunlin, 63201, Taiwan (China)

    2011-10-31

    The effect of a nickel oxide (NiO{sub x}) seed layer on the crystallization and photocatalytic activity of the sequentially plasma-enhanced chemical vapor deposited amorphous titanium oxide (TiO{sub x}) thin film processed by a post-annealing process was investigated. The evolution of the crystalline structures, chemical bond configurations, and surface/cross-sectional morphologies of the annealed TiO{sub x} films, with and without a NiO{sub x} seed layer, was examined using X-ray diffractometer, Fourier transform infrared spectrometry, X-ray photoelectron spectroscopy, atomic force microscopy, and field emission scanning electron microscope measurements. Thermo- and photo-induced hydrophilicity was determined by measuring the contact angle of water droplet. Photocatalytic activity after UV light irradiation was evaluated from the decolorization of a methylene blue solution. The crystallization temperature of the TiO{sub x} film, deposited on a NiO{sub x} seed layer, was found to be lower than that of a pure TiO{sub x} film, further improving the thermo- and photo-induced surface super-hydrophilicity. The TiO{sub x} film deposited onto the NiO{sub x} seed layer, resulting in significant cluster boundaries, showed a rough surface morphology and proved to alleviate the anatase crystal growth by increasing the post-annealing temperature, which yielded a more active surface area and prohibited the recombination of photogenerated electrons and holes. The photocatalytic activity of the NiO{sub x}/TiO{sub x} system with such a textured surface therefore was enhanced and optimized through an adequate post-annealing process.

  20. Advances in the Remote Glow Discharge Experiment

    Science.gov (United States)

    Dominguez, Arturo; Zwicker, A.; Rusaits, L.; McNulty, M.; Sosa, Carl

    2014-10-01

    The Remote Glow Discharge Experiment (RGDX) is a DC discharge plasma with variable pressure, end-plate voltage and externally applied axial magnetic field. While the experiment is located at PPPL, a webcam displays the live video online. The parameters (voltage, magnetic field and pressure) can be controlled remotely in real-time by opening a URL which shows the streaming video, as well as a set of Labview controls. The RGDX is designed as an outreach tool that uses the attractive nature of a plasma in order to reach a wide audience and extend the presence of plasma physics and fusion around the world. In March 2014, the RGDX was made publically available and, as of early July, it has had approximately 3500 unique visits from 107 countries and almost all 50 US states. We present recent upgrades, including the ability to remotely control the distance between the electrodes. These changes give users the capability of measuring Paschen's Law remotely and provides a comprehensive introduction to plasma physics to those that do not have access to the necessary equipment.

  1. Shear and Bulk Viscosities of a Weakly Coupled Quark Gluon Plasma with Finite Chemical Potential and Temperature---Leading-Log Results

    CERN Document Server

    Chen, Jiunn-Wei; Song, Yu-Kun; Wang, Qun

    2012-01-01

    We calculate the shear (eta) and bulk (zeta) viscosities of a weakly coupled quark gluon plasma at the leading-log order with finite temperature T and quark chemical potential mu. We find that the shear viscosity to entropy density ratio eta/s increases monotonically with mu and eventually scales as (mu/T)^2 at large mu. In contrary, zeta/s is insensitive to mu. Both eta/s and zeta/s are monotonically decreasing functions of the quark flavor number N_f when N_f \\geq 2. This property is also observed in pion gas systems. Our perturbative calculation suggests that QCD becomes the most perfect (i.e. with the smallest eta/s) at mu=0 and N_f = 16 (the maximum N_f with asymptotic freedom). It would be interesting to test whether the currently smallest eta/s computed close to the phase transition with mu=0 and N_f = 0 can be further reduced by increasing N_f.

  2. Si nanowires grown by Al-catalyzed plasma-enhanced chemical vapor deposition: synthesis conditions, electrical properties and application to lithium battery anodes

    Science.gov (United States)

    Toan, Le Duc; Moyen, Eric; Zamfir, Mihai Robert; Joe, Jemee; Kim, Young Woo; Pribat, Didier

    2016-01-01

    Silicon nanowires have been synhesized using Al as a catalyst. Silane (SiH4) diluted in H2 carrier gas was employed as Si precursor in a plasma enhanced chemical vapor deposition system operated at various temperatures (450 °C and 550 °C). Those growth temperatures, which are lower than the eutectic temperature in the Al-Si system (577 °C) suggests a vapor-solid-solid growth mechanism. Four point resistance measurements and back-gated current-voltage measurements indicated that silicon nanowires were heavily doped (p type), with a doping concentration of a few 1019 cm-3. We have measured hole mobility values of ˜16 cm2 V-1 s-1 at 450 °C and ˜30 cm2 V-1 s-1 at 550 °C. Transmission electron microscope analyses showed that the silicon nanowires were highly twinned even when they grow epitaxially on (111) Si substrates. We have also evaluated the use of those highly doped Si nanowires for lithium-ion battery anodes. We have observed a good cycling behavior during the first 65 charge-discharge cycles, followed by a slow capacity decay. After 150 cycles at a charge-discharge rate of 0.1 C, the electrode capacity was still 1400 mAh g-1. The ageing mechanism seems to be related to the delamination of the SiNWs from the stainless steel substrate on which they were grown.

  3. Chemical Isotope Labeling LC-MS for Monitoring Disease Progression and Treatment in Animal Models: Plasma Metabolomics Study of Osteoarthritis Rat Model

    Science.gov (United States)

    Chen, Deying; Su, Xiaoling; Wang, Nan; Li, Yunong; Yin, Hua; Li, Liang; Li, Lanjuan

    2017-01-01

    We report a chemical isotope labeling (CIL) liquid chromatography mass spectrometry (LC-MS) method generally applicable for tracking metabolomic changes from samples collected in an animal model for studying disease development and treatment. A rat model of surgically induced osteoarthritis (OA) was used as an example to illustrate the workflow and technical performance. Experimental duplicate analyses of 234 plasma samples were carried out using dansylation labeling LC-MS targeting the amine/phenol submetabolome. These samples composed of 39 groups (6 rats per group) were collected at multiple time points with sham operation, OA control group, and OA rats with treatment, separately, using glucosamine/Celecoxib and three traditional Chinese medicines (Epimedii folium, Chuanxiong Rhizoma and Bushen-Huoxue). In total, 3893 metabolites could be detected and 2923 of them were consistently detected in more than 50% of the runs. This high-coverage submetabolome dataset could be used to track OA progression and treatment. Many differentiating metabolites were found and 11 metabolites including 2-aminoadipic acid, saccharopine and GABA were selected as potential biomarkers of OA progression and OA treatment. This study illustrates that CIL LC-MS is a very useful technique for monitoring incremental metabolomic changes with high coverage and accuracy for studying disease progression and treatment in animal models.

  4. SiO{sub 2}/TiO{sub 2} thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Gracia, F. [Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla) and Dpt. Q. Inorganica, Avda. Americo Vespucio s/n, 41092 Sevilla (Spain); Yubero, F. [Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla) and Dpt. Q. Inorganica, Avda. Americo Vespucio s/n, 41092 Sevilla (Spain); Holgado, J.P. [Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla) and Dpt. Q. Inorganica, Avda. Americo Vespucio s/n, 41092 Sevilla (Spain); Espinos, J.P. [Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla) and Dpt. Q. Inorganica, Avda. Americo Vespucio s/n, 41092 Sevilla (Spain); Gonzalez-Elipe, A.R. [Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla) and Dpt. Q. Inorganica, Avda. Americo Vespucio s/n, 41092 Sevilla (Spain)]. E-mail: arge@icmse.csic.es; Girardeau, T. [Laboratoire de Metallurgie Physique de Poitiers, UMR 6630 CNRS, Bat SP2MI BP 30179, 86962-Futuroscope-Chasseneuil Cedex (France)

    2006-04-03

    SiO{sub 2}/TiO{sub 2} optical thin films with variable compositions have been prepared by ion beam induced and plasma enhanced chemical vapour deposition (IBICVD and PECVD). While the films obtained by IBICVD were very compact, the PECVD ones with a high content of Ti presented a columnar microstructure. The formation of Si-O-Ti bonds and a change in the environment around titanium from four- to six-coordinated has been proved by vibrational and X-ray absorption spectroscopies. The refractive index increased with the titanium content from 1.45 to 2.46 or 2.09 for, respectively, the IBICVD and PECVD films. Meanwhile, the band gap decreased, first sharply and then more smoothly up to the value of pure TiO{sub 2}. It is concluded that the optical properties of SiO{sub 2}/TiO{sub 2} thin films can be properly tailored by using these two procedures.

  5. Optical and morphological properties of SiN{sub x}/Si amorphous multilayer structures grown by Plasma Enhanced Chemical Vapor Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Santana, G.; Melo, O. de; Monroy, B.M.; Fandino, J.; Ortiz, A.; Alonso, J.C. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Cd. Universitaria, A.P. 70-360, Coyoacan (Mexico); Aguilar-Hernandez, J.; Cruz, F.; Contreras-Puentes, G. [Escuela Superior de Fisica y Matematicas del Instituto Politecnico Nacional; Edificio 9, U.P.A.L.M. (Mexico)

    2005-08-01

    Very thin layers of Si were grown in between silicon nitride layers using Plasma Enhanced Chemical Vapor Deposition (PECVD) technique and SiH{sub 2}Cl{sub 2}/H{sub 2}/NH{sub 3} mixtures. Deposition conditions were selected to favor Si cluster formation. Room Temperature Photoluminescence (RT-PL) and optical transmission in different ranges were used to evaluate the optical and structural properties of the films. Scanning Electron Microscopy (SEM) of the cross section of cleaved samples allowed to observe a clear pattern of Si clusters embedded in the SiN matrix. The UV-VIS absorption spectra present two band edges. We assume that the higher band gap is due to the amorphous Si clusters. RT-PL spectra are characterized by two broad bands: one centered at 1.5 eV and the other at 2.1 eV. The broad luminescence centered at 2.1 eV could be associated with the higher band gap observed in absorption spectrum. After vacuum annealing of the samples at 400 and ordm;C, the band at 2.1 eV disappears. (copyright 2005 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  6. Growth of Ge nanoparticles on SiO{sub 2}/Si interfaces during annealing of plasma enhanced chemical vapor deposited thin films

    Energy Technology Data Exchange (ETDEWEB)

    Foss, S. [Department of Physics, University of Oslo, PO Box 1048-Blindern, N-0316 (Norway)]. E-mail: stefoss@fys.uio.no; Finstad, T.G. [Department of Physics, University of Oslo, PO Box 1048-Blindern, N-0316 (Norway); Dana, A. [Department of Physics, Bilkent University, 06800 Ankara (Turkey); Aydinli, A. [Department of Physics, Bilkent University, 06800 Ankara (Turkey)

    2007-06-04

    Multilayer germanosilicate (Ge:SiO{sub 2}) films have been grown by plasma enhanced chemical vapor deposition. Each Ge:SiO{sub 2} layer is separated by a pure SiO{sub 2} layer. The samples were heat treated at 900 deg. C for 15 and 45 min. Transmission electron microscopy investigations show precipitation of particles in the layers of highest Ge concentration. Furthermore there is evidence of diffusion between the layers. This paper focuses mainly on observed growth of Ge particles close to the interface, caused by Ge diffusion from the Ge:SiO{sub 2} layer closest to the interface through a pure SiO{sub 2} layer and to the interface. The particles grow as spheres in a direction away from the interface. Particles observed after 15 min anneal time are 4 nm in size and are amorphous, while after 45 min anneal time they are 7 nm in size and have a crystalline diamond type Ge structure.

  7. Single liquid source plasma-enhanced metalorganic chemical vapor deposition of high-quality YBa2Cu3O(7-x) thin films

    Science.gov (United States)

    Zhang, Jiming; Gardiner, Robin A.; Kirlin, Peter S.; Boerstler, Robert W.; Steinbeck, John

    1992-01-01

    High quality YBa2Cu3O(7-x) films were grown in-situ on LaAlO3 (100) by a novel single liquid source plasma-enhanced metalorganic chemical vapor deposition process. The metalorganic complexes M(thd) (sub n), (thd = 2,2,6,6-tetramethyl-3,5-heptanedionate; M = Y, Ba, Cu) were dissolved in an organic solution and injected into a vaporizer immediately upstream of the reactor inlet. The single liquid source technique dramatically simplifies current CVD processing and can significantly improve the process reproducibility. X-ray diffraction measurements indicated that single phase, highly c-axis oriented YBa2Cu3O(7-x) was formed in-situ at substrate temperature 680 C. The as-deposited films exhibited a mirror-like surface, had transition temperature T(sub cO) approximately equal to 89 K, Delta T(sub c) less than 1 K, and Jc (77 K) = 10(exp 6) A/sq cm.

  8. Quantification of low levels of organochlorine pesticides using small volumes (plasma of wild birds through gas chromatography negative chemical ionization mass spectrometry.

    Science.gov (United States)

    Rivera-Rodríguez, Laura B; Rodríguez-Estrella, Ricardo; Ellington, James Jackson; Evans, John J

    2007-07-01

    A solid phase extraction and gas chromatography with negative chemical ionization mass spectrometry in scan mode (GC-NCI-MS) method was developed to identify and quantify for the first time low levels of organochlorine pesticides (OCs) in plasma samples of less than 100 microl from wild birds. The method detection limits ranged from 0.012 to 0.102 pg/microl and the method reporting limit from 0.036 to 0.307 pg/microl for alpha, gamma, beta and delta-hexachlorocyclohexane (HCH), heptachlor, aldrin, heptachlor epoxide, endosulfan I, 1,1-dichloro-2,2-bis(p-chlorophenyl)ethylene (p,p'-DDE), dieldrin, endrin, endosulfan-II, endrin-aldehyde and endosulfan-sulfate. Pesticide levels in small serum samples from individual Falco sparverius, Sturnella neglecta, Mimus polyglottos and Columbina passerina were quantified. Concentrations ranged from not detected (n/d) to 204.9 pg/microl for some OC pesticides. All levels in the food web in and around cultivated areas showed the presence of pesticides notwithstanding the small areas for agriculture existing in the desert of Baja California peninsula.

  9. Potential of gas chromatography-atmospheric pressure chemical ionization-time-of-flight mass spectrometry for the determination of sterols in human plasma.

    Science.gov (United States)

    Matysik, S; Schmitz, G; Bauer, S; Kiermaier, J; Matysik, F-M

    2014-04-11

    The application of Gas Chromatography (GC)-Atmospheric Pressure Chemical Ionization (APCI)-Time-of-Flight Mass Spectrometry (TOF-MS) is presented for sterol analysis in human plasma. A commercial APCI interface was modified to ensure a well-defined humidity which is essential for controlled ionization. In the first step, optimization regarding flow rates of auxiliary gases was performed by using a mixture of model analytes. Secondly, the qualitative and quantitative analysis of sterols including oxysterols, cholesterol precursors, and plant sterols as trimethylsilyl-derivatives was successfully carried out. The characteristics of APCI together with the very good mass accuracy of TOF-MS data enable the reliable identification of relevant sterols in complex matrices. Linear calibration lines and plausible results for healthy volunteers and patients could be obtained whereas all mass signals were extracted with an extraction width of 20 ppm from the full mass data set. One advantage of high mass accuracy can be seen in the fact that from one recorded run any search for m/z can be performed. Copyright © 2014 Elsevier Inc. All rights reserved.

  10. Formation and characterization of the MgO protecting layer deposited by plasma-enhanced metal-organic chemical-vapor deposition

    CERN Document Server

    Kang, M S; Byun, J C; Kim, D S; Choi, C K; Lee, J Y; Kim, K H

    1999-01-01

    MgO films were prepared on Si(100) and soda-lime glass substrates by using plasma-enhanced metal-organic chemical-vapor deposition. Various ratios of the O sub 2 /CH sub 3 MgO sup t Bu gas mixture and various gas flow rates were tested for the film fabrications. Highly (100)-oriented MgO films with good crystallinity were obtained with a 10 sccm CH sub 3 MgO sup t Bu flow without an O sub 2 gas flow. About 5 % carbon was contained in all the MgO films. The refractive index and the secondary electron emission coefficient for the best quality film were 1.43 and 0.45, respectively. The sputtering rate was about 0.2 nm/min for 10 sup 1 sup 1 cm sup - sup 3 Ar sup + ion density. Annealing at 500 .deg. C in an Ar ambient promoted the grain size without inducing a phase transition.

  11. Effects of annealing temperature on crystallisation kinetics and properties of polycrystalline Si thin films and solar cells on glass fabricated by plasma enhanced chemical vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Tao Yuguo, E-mail: yuguo.tao@hotmail.com [Photovoltaics Centre of Excellence, University of New South Wales, Sydney NSW 2052 (Australia); Varlamov, Sergey; Jin, Guangyao [Photovoltaics Centre of Excellence, University of New South Wales, Sydney NSW 2052 (Australia); Wolf, Michael; Egan, Renate [CSG Solar Pty Ltd, Sydney, NSW (Australia)

    2011-10-31

    Solid-phase crystallisation of Si thin films on glass fabricated by plasma enhanced chemical vapour deposition is compared at different annealing temperatures. Four independent techniques, optical transmission microscopy, Raman and UV reflectance spectroscopy, and X-ray diffraction, are used to characterise the crystallisation kinetics and film properties. The 1.5 {mu}m thick films with the n+/p-/p+ solar cell structure have incubation times of about 300, 53, and 14 min and full crystallisation times of about 855, 128, and 30 min at 600 deg. C, 640 deg. C, and 680 deg. C respectively. Estimated activation energies for incubation and crystal growth are 2.7 and 3.2 eV respectively. The average grain size in the resulting polycrystalline Si films measured from scanning electron microscopy images gradually decreases with a higher annealing temperature and the crystal quality becomes poorer according to the Raman, UV reflection, and X-ray diffraction results. The dopant activation and majority carrier mobilities in heavily doped n+ and p+ layers are similar for all crystallisation temperatures. Both the open-circuit voltage and the spectral response are lower for the cells crystallised at higher temperatures and the minority carrier diffusion lengths are shorter accordingly although they are still longer than the cell thickness for all annealing temperatures. The results indicate that shortening the crystallisation time by merely increasing the crystallisation temperature offers little or no merits for PECVD polycrystalline Si thin-film solar cells on glass.

  12. Thermal Modification of a-SiC:H Films Deposited by Plasma Enhanced Chemical Vapour Deposition from CH4+SiH4 Mixtures

    Institute of Scientific and Technical Information of China (English)

    刘玉学; 王宁会; 刘益春; 申德振; 范希武; 李灵燮

    2001-01-01

    The effects of thermal annealing on photoluminescence (PL) and structural properties of a-Si1-xCx :H films deposited by plasma enhanced chemical vapour deposition from CH4+SiH4 mixtures are studied by using infrared, PL and transmittance-reflectance spectra. In a-SiC:H network, high-temperature annealing gives rise to the effusion of hydrogen from strongly bonded hydrogen in SiH, SiH2, (SiH2)n, SiCHn and CHn configurations and the break of weak C-C, Si-Si and C-Si bonds. A structural rearrangement will occur, which causes a significant correlation of the position and intensity of the PL signal with the annealing temperature. The redshift of the PL peak is related to the destruction of the confining power of barriers. However, the PL intensity does not have a significant correlation with the annealing temperature for a C-rich a-SiC:H network, which refers to the formation of π-bond cluster as increasing carbon content. It is indicated that the thermal stability of C-rich a-Si1-xCx:H films is better than that of Si-like a-Si1-xCx :H films.

  13. Single liquid source plasma-enhanced metalorganic chemical vapor deposition of high-quality YBa2Cu3O(7-x) thin films

    Science.gov (United States)

    Zhang, Jiming; Gardiner, Robin A.; Kirlin, Peter S.; Boerstler, Robert W.; Steinbeck, John

    1992-01-01

    High quality YBa2Cu3O(7-x) films were grown in-situ on LaAlO3 (100) by a novel single liquid source plasma-enhanced metalorganic chemical vapor deposition process. The metalorganic complexes M(thd) (sub n), (thd = 2,2,6,6-tetramethyl-3,5-heptanedionate; M = Y, Ba, Cu) were dissolved in an organic solution and injected into a vaporizer immediately upstream of the reactor inlet. The single liquid source technique dramatically simplifies current CVD processing and can significantly improve the process reproducibility. X-ray diffraction measurements indicated that single phase, highly c-axis oriented YBa2Cu3O(7-x) was formed in-situ at substrate temperature 680 C. The as-deposited films exhibited a mirror-like surface, had transition temperature T(sub cO) approximately equal to 89 K, Delta T(sub c) less than 1 K, and Jc (77 K) = 10(exp 6) A/sq cm.

  14. Nanocrystalline-Si-dot multi-layers fabrication by chemical vapor deposition with H-plasma surface treatment and evaluation of structure and quantum confinement effects

    Directory of Open Access Journals (Sweden)

    Daisuke Kosemura

    2014-01-01

    Full Text Available 100-nm-thick nanocrystalline silicon (nano-Si-dot multi-layers on a Si substrate were fabricated by the sequential repetition of H-plasma surface treatment, chemical vapor deposition, and surface oxidation, for over 120 times. The diameter of the nano-Si dots was 5–6 nm, as confirmed by both the transmission electron microscopy and X-ray diffraction analysis. The annealing process was important to improve the crystallinity of the nano-Si dot. We investigated quantum confinement effects by Raman spectroscopy and photoluminescence (PL measurements. Based on the experimental results, we simulated the Raman spectrum using a phenomenological model. Consequently, the strain induced in the nano-Si dots was estimated by comparing the experimental and simulated results. Taking the estimated strain value into consideration, the band gap modulation was measured, and the diameter of the nano-Si dots was calculated to be 5.6 nm by using PL. The relaxation of the q ∼ 0 selection rule model for the nano-Si dots is believed to be important to explain both the phenomena of peak broadening on the low-wavenumber side observed in Raman spectra and the blue shift observed in PL measurements.

  15. Plasma enhanced chemical vapor deposition of Cr{sub 2}O{sub 3} thin films using chromium hexacarbonyl (Cr(CO){sub 6}) precursor

    Energy Technology Data Exchange (ETDEWEB)

    Wang Jinwen [Center for Materials for Information Technology and Department of Chemical and Biological Engineering, University of Alabama, Tuscaloosa, AL 35487 (United States)], E-mail: wang006@bama.ua.edu; Gupta, Arunava; Klein, Tonya M. [Center for Materials for Information Technology and Department of Chemical and Biological Engineering, University of Alabama, Tuscaloosa, AL 35487 (United States)

    2008-09-01

    Chromium oxide (Cr{sub 2}O{sub 3}) thin films have been deposited by plasma enhanced chemical vapor deposition on c-cut sapphire (Al{sub 2}O{sub 3}) and oxidized silicon substrates at temperatures between 250 and 400 deg. C using the precursor chromium hexacarbonyl (Cr(CO){sub 6}). The film growth rate ranges between 5 and 14 A/min, with the growth rate going through a maximum at 300 deg. C before decreasing at higher temperature, suggesting the presence of competing deposition and desorption reaction channels. Scanning electron microscope images indicate that the density of grains and film crystallinity increases with increasing substrate temperatures, while atomic force microscopy shows an overall decrease in film roughness with increasing temperature. Normal {theta} - 2{theta} Bragg X-ray diffraction results show that films deposited on SiO{sub 2} are polycrystalline, while those on sapphire have a preferred (0 0 0 l) orientation. The epitaxial nature of the film growth on Al{sub 2}O{sub 3} has been confirmed from the symmetry of off-axis X-ray scans.

  16. Tribological properties and thermal stability of hydrogenated, silicon/nitrogen-coincorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition

    Science.gov (United States)

    Nakazawa, Hideki; Okuno, Saori; Magara, Kohei; Nakamura, Kazuki; Miura, Soushi; Enta, Yoshiharu

    2016-12-01

    We have deposited hydrogenated, silicon/nitrogen-incorporated diamond-like carbon (Si-N-DLC) films by plasma-enhanced chemical vapor deposition using hexamethyldisilazane [((CH3)3Si)2NH; HMDS] as the Si and N source, and compared the tribological performance and thermal stability of the Si-N-DLC films with those of hydrogenated, Si-incorporated DLC (Si-DLC) films prepared using dimethylsilane [SiH2(CH3)2] as the Si source. The deposited films were annealed at 723-873 K in air atmosphere. The friction coefficients of hydrogenated DLC films after annealing significantly increased at the initial stages of friction tests. On the other hand, the friction coefficients of the Si-N-DLC films deposited at an HMDS flow ratio [HMDS/(HMDS+CH4)] of 2.27% remained low after the annealing even at 873 K. We found that the wear rate of the Si-N-DLC film deposited at 2.27% and -1000 V remained almost unchanged after the annealing at 873 K, whereas that of the Si-DLC film with a similar Si fraction deposited at -1000 V significantly increased after the annealing at 773 K.

  17. Hydrogenated amorphous carbon-nitride films deposited on Si(100) by direct-current saddle-field plasma-enhanced chemical-vapor deposition

    CERN Document Server

    Jang, H K; Lee, Y S; Whangbo, S W; Whang, C N; Yoo, Y Z; Kim, H G

    1999-01-01

    Hydrogenated amorphous carbon nitride [a-C:H(N)] films were deposited using dc saddle-field plasma-enhanced chemical-vapor deposition. The structural and the compositional changes induced in the films by the different flow-rate ratios of N sub 2 to CH sub 4 (n sub N sub 2 /n sub C sub H sub sub 4) were investigated using Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy. The deposition rate of the films abruptly decreased upon increasing the n sub N sub 2 /n sub C sub H sub sub 4 ratio. However, for n sub N sub 2 /n sub C sub H sub sub 4 >0.5, the deposition rate slightly decreased with increasing n sub N sub 2 /n sub C sub H sub sub 4. The ratio of N to C (N/C) of the films saturated to 0.25 with increasing n sub N sub 2 /n sub C sub H sub sub 4. The numbers of N-H and C ident to N bonds in the films increased with increasing n sub N sub 2 /n sub C sub H sub sub 4 , but the number of C-H bonds decreased. The optical band-gap energy of the films decreased from 2.53 eV to 2.3 eV as t...

  18. A rapid and sensitive UHPLC-FT-ICR MS/MS method for identification of chemical constituents in Rhodiola crenulata extract, rat plasma and rat brain after oral administration.

    Science.gov (United States)

    Han, Fei; Li, Yanting; Ma, Li; Liu, Tianfeng; Wu, Yawen; Xu, Rui; Song, Aihua; Yin, Ran

    2016-11-01

    A rapid and sensitive UHPLC-FT-ICR MS/MS method was developed for the first time to analyze the extract of Rhodiola crenulata and the constituents absorbed into rat blood and brain after oral administration. Under the optimized conditions, a total of 64 chemical constituents were identified or tentatively characterized in vitro in 30min, and also 24 and 9 chemical constituents were detected in rat plasma and brain respectively, by comparing the retention time, accurate mass and/or MS/MS data of blank and dosed sample. The results indicated that the developed UHPLC-FT-ICR MS/MS method was suitable for detection and identifying the chemical constituents in Rhodiola crenulata extract, rat plasma and rat brain, and it could be used as a powerful and reliable analytical strategy for rapid identification of chemical constituents in vitro and in vivo for other traditional Chinese herbal medicines (TCMs). Furthermore, the detected chemical constituents in rat brain could be speculated to be the pharmacodynamic substances of Rhodiola crenulata for Alzheimer's disease (AD) and it could also provide useful chemical information for further mass spectrometry imaging and bioactive substances research on Rhodiola crenulata.

  19. PACKAGE (Plasma Analysis, Chemical Kinetics and Generator Efficiency): a computer program for the calculation of partial chemical equilibrium/partial chemical rate controlled composition of multiphased mixtures under one dimensional steady flow

    Energy Technology Data Exchange (ETDEWEB)

    Yousefian, V.; Weinberg, M.H.; Haimes, R.

    1980-02-01

    The NASA CEC Code was the starting point for PACKAGE, whose function is to evaluate the composition of a multiphase combustion product mixture under the following chemical condi