Poisson-Spot Intensity Reduction with a Partially-Transparent Petal-Shaped Optical Mask
Shiri, Shahram; Wasylkiwskyj, Wasyl
2013-01-01
The presence of Poisson's spot, also known as the spot of Arago, formed along the optical axis in the geometrical shadow behind an obstruction, has been known since the 18th century. The presence of this spot can best be described as the consequence of constructive interference of light waves diffracted on the edge of the obstruction where its central position can··be determined by the symmetry of the object More recently, the elimination of this spot has received attention in the fields of particle physics, high-energy lasers, astronomy and lithography. In this paper, we introduce a novel, partially transparent petaled mask shape that suppresses the bright spot by up to 10 orders of magnitude in intensity, with powerful applications to many of the above fields. The optimization technique formulated in this design can identify mask shapes having partial transparency only near the petal tips.
Landis, Stefan
2013-01-01
Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components.
Rayleigh-Sommerfield Diffraction vs Fresnel-Kirchhoff, Fourier Propagation and Poisson's Spot
National Research Council Canada - National Science Library
Lucke, Robert
2004-01-01
.... But when this approximation is not valid, FK can lead to unacceptable answers. Calculating the on-axis intensity of Poisson s spot provides a critical test, a test passed by RS and failed by FK. FK fails because (a) convergence of the integral depends on how it is evaluated and (b) when the convergence problem is xed, the predicted amplitude at points near the obscuring disk is not consistent with the assumed boundary conditions.
Directory of Open Access Journals (Sweden)
Rodrigues-Motta Mariana
2008-07-01
Full Text Available Abstract Dark spots in the fleece area are often associated with dark fibres in wool, which limits its competitiveness with other textile fibres. Field data from a sheep experiment in Uruguay revealed an excess number of zeros for dark spots. We compared the performance of four Poisson and zero-inflated Poisson (ZIP models under four simulation scenarios. All models performed reasonably well under the same scenario for which the data were simulated. The deviance information criterion favoured a Poisson model with residual, while the ZIP model with a residual gave estimates closer to their true values under all simulation scenarios. Both Poisson and ZIP models with an error term at the regression level performed better than their counterparts without such an error. Field data from Corriedale sheep were analysed with Poisson and ZIP models with residuals. Parameter estimates were similar for both models. Although the posterior distribution of the sire variance was skewed due to a small number of rams in the dataset, the median of this variance suggested a scope for genetic selection. The main environmental factor was the age of the sheep at shearing. In summary, age related processes seem to drive the number of dark spots in this breed of sheep.
Boulenger, Caroline; Caze, Jean-Luc; Mihet, Mihaela
2006-03-01
The goal of overall process and yield improvement requires a litho defect management and reduction strategy, which includes several layers of tactical methods. Defects may be identified through a number of schemes, including After-Develop Inspection (ADI), which was the primary tool in this study in our 0,13μ fab. Defects on 193nm contact hole lithography were identified using a KLA-Tencor 2351 High Resolution Imaging Patterned Wafer Inspection System, coupled with in-line Automatic Defect Classification (iADC). The optimized inspection was used at the core of the Photo Cell Monitor (PCM) to isolate critical defect types. PCM uses the fab's standard production resist coat, exposure, develop, and rinse process, with the focus and exposure optimized for resist on silicon test wafers. Through Pareto analysis of 193nm defects, one defect type, called satellite spot, was targeted for immediate improvement and monitoring. This paper describes the work done in improving the litho defectivity. The work includes optimization of inspection and classification parameters and the Design of Experiments (DOE) to identify the source (including the interaction between the resist and developer) and contributing factors. Several process modifications were identified which resulted in lowered defectivity up to complete suppression of satellite spot defects, although at higher process complexity and cost. This work was also done in conjunction with resist suppliers, which used the same inspection to confirm the problem at their facilities. The work with the suppliers continues with the goal of identifying a less expensive permanent solution.
Deposition of sol-gel sensor spots by nanoimprint lithography and hemi-wicking
DEFF Research Database (Denmark)
Mikkelsen, Morten Bo Lindholm; Marie, Rodolphe; Hansen, Jan H.
2011-01-01
-wicking, a deposited droplet spreads, guided by the posts, to automatically fill the imprinted structure, not being sensitive to alignment as long as it is deposited inside the patterned area. Hemi-wicking is an effective method to immobilize a low viscosity liquid material in well-defined spots on a surface, when...... ratio is therefore constant all over the surface of the liquid spread by hemi-wicking, when considering length scales larger than the microstructure period. Material redistribution caused by solvent evaporation, i.e., the "coffee ring effect", can therefore be avoided because the evaporation rate does...... conventional methods such as screen- or stamp-printing do not work. On length scales of the order of the microstructure period, surface tension will govern the shape of the liquid-air interface, and the liquid will climb up the pillars to keep a fixed contact angle with the sidewalls. The surface to volume...
DEFF Research Database (Denmark)
Fokianos, Konstantinos; Rahbek, Anders Christian; Tjøstheim, Dag
This paper considers geometric ergodicity and likelihood based inference for linear and nonlinear Poisson autoregressions. In the linear case the conditional mean is linked linearly to its past values as well as the observed values of the Poisson process. This also applies to the conditional...... variance, implying an interpretation as an integer valued GARCH process. In a nonlinear conditional Poisson model, the conditional mean is a nonlinear function of its past values and a nonlinear function of past observations. As a particular example an exponential autoregressive Poisson model for time...... series is considered. Under geometric ergodicity the maximum likelihood estimators of the parameters are shown to be asymptotically Gaussian in the linear model. In addition we provide a consistent estimator of the asymptotic covariance, which is used in the simulations and the analysis of some...
DEFF Research Database (Denmark)
Fokianos, Konstantinos; Rahbek, Anders Christian; Tjøstheim, Dag
2009-01-01
In this article we consider geometric ergodicity and likelihood-based inference for linear and nonlinear Poisson autoregression. In the linear case, the conditional mean is linked linearly to its past values, as well as to the observed values of the Poisson process. This also applies to the condi......In this article we consider geometric ergodicity and likelihood-based inference for linear and nonlinear Poisson autoregression. In the linear case, the conditional mean is linked linearly to its past values, as well as to the observed values of the Poisson process. This also applies...... to the conditional variance, making possible interpretation as an integer-valued generalized autoregressive conditional heteroscedasticity process. In a nonlinear conditional Poisson model, the conditional mean is a nonlinear function of its past values and past observations. As a particular example, we consider...... ergodicity proceeds via Markov theory and irreducibility. Finding transparent conditions for proving ergodicity turns out to be a delicate problem in the original model formulation. This problem is circumvented by allowing a perturbation of the model. We show that as the perturbations can be chosen...
DEFF Research Database (Denmark)
Fokianos, Konstantinos; Rahbæk, Anders; Tjøstheim, Dag
This paper considers geometric ergodicity and likelihood based inference for linear and nonlinear Poisson autoregressions. In the linear case the conditional mean is linked linearly to its past values as well as the observed values of the Poisson process. This also applies to the conditional...... proceeds via Markov theory and irreducibility. Finding transparent conditions for proving ergodicity turns out to be a delicate problem in the original model formulation. This problem is circumvented by allowing a perturbation of the model. We show that as the perturbations can be chosen to be arbitrarily...
Harriott, Lloyd R.
1997-04-01
Electron beams have played a significant role in semiconductor technology for more than twenty years. Early electron beam machines used a raster scanned beam spot to write patterns in electron-sensitive polymer resist materials. The main application of electron beam lithography has been in mask making. Despite the inherently high spatial resolution and wide process margins of electron beam lithography, the writing rate for semiconductor wafers has been too slow to be economically viable on a large scale. In the late 1970's, variable shape electron beam writing was developed, projecting a rectangular beam whose size can be varied for each "shot" exposure of a particular pattern, allowing some integrated circuits to be made economically where a variety of "customized" patterns are desired. In the cell or block projection electron beam exposure technique, a unit cell of a repetitive pattern is projected repeatedly to increase the level of parallelism. This can work well for highly repetitive patterns such as memory chips but is not well suited to complex varying patterns such as microprocessors. The rapid progress in the performance of integrated circuits has been largely driven by progress in optical lithography, through improvements in lens design and fabrication as well as the use of shorter wavelengths for the exposure radiation. Due to limitations from the opacity of lens and mask materials, it is unlikely that conventional optical printing methods can be used at wavelengths below 193 nm or feature sizes much below 180 nm. One candidate technology for a post-optical era is the Scattering with Angular Limitation Projection Electron-beam Lithography (SCALPEL) approach, which combines the high resolution and wide process latitude inherent in electron beam lithography with the throughput of a parallel projection system. A mask consisting of a low atomic number membrane and a high atomic number pattern layer is uniformly illuminated with high energy (100 ke
Landis, Stefan
2013-01-01
Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics,
Einspruch, Norman G
1987-01-01
VLSI Electronics Microstructure Science, Volume 16: Lithography for VLSI treats special topics from each branch of lithography, and also contains general discussion of some lithographic methods.This volume contains 8 chapters that discuss the various aspects of lithography. Chapters 1 and 2 are devoted to optical lithography. Chapter 3 covers electron lithography in general, and Chapter 4 discusses electron resist exposure modeling. Chapter 5 presents the fundamentals of ion-beam lithography. Mask/wafer alignment for x-ray proximity printing and for optical lithography is tackled in Chapter 6.
Poisson integrators for Lie-Poisson structures on R3
International Nuclear Information System (INIS)
Song Lina
2011-01-01
This paper is concerned with the study of Poisson integrators. We are interested in Lie-Poisson systems on R 3 . First, we focus on Poisson integrators for constant Poisson systems and the transformations used for transforming Lie-Poisson structures to constant Poisson structures. Then, we construct local Poisson integrators for Lie-Poisson systems on R 3 . Finally, we present the results of numerical experiments for two Lie-Poisson systems and compare our Poisson integrators with other known methods.
Homogeneous Poisson structures
International Nuclear Information System (INIS)
Shafei Deh Abad, A.; Malek, F.
1993-09-01
We provide an algebraic definition for Schouten product and give a decomposition for any homogenenous Poisson structure in any n-dimensional vector space. A large class of n-homogeneous Poisson structures in R k is also characterized. (author). 4 refs
Zeroth Poisson Homology, Foliated Cohomology and Perfect Poisson Manifolds
Martínez-Torres, David; Miranda, Eva
2018-01-01
We prove that, for compact regular Poisson manifolds, the zeroth homology group is isomorphic to the top foliated cohomology group, and we give some applications. In particular, we show that, for regular unimodular Poisson manifolds, top Poisson and foliated cohomology groups are isomorphic. Inspired by the symplectic setting, we define what a perfect Poisson manifold is. We use these Poisson homology computations to provide families of perfect Poisson manifolds.
International Nuclear Information System (INIS)
Harwood, L.H.
1981-01-01
At MSU we have used the POISSON family of programs extensively for magnetic field calculations. In the presently super-saturated computer situation, reducing the run time for the program is imperative. Thus, a series of modifications have been made to POISSON to speed up convergence. Two of the modifications aim at having the first guess solution as close as possible to the final solution. The other two aim at increasing the convergence rate. In this discussion, a working knowledge of POISSON is assumed. The amount of new code and expected time saving for each modification is discussed
Directory of Open Access Journals (Sweden)
S. M. Kennedy
2012-06-01
Full Text Available A maskless method of electron beam lithography is described which uses the reflection of an electron beam from an electrostatic mirror to produce caustics in the demagnified image projected onto a resist–coated wafer. By varying the electron optics, e.g. via objective lens defocus, both the morphology and dimensions of the caustic features may be controlled, producing a range of bright and tightly focused projected features. The method is illustrated for line and fold caustics and is complementary to other methods of reflective electron beam lithography.
Scaling the Poisson Distribution
Farnsworth, David L.
2014-01-01
We derive the additive property of Poisson random variables directly from the probability mass function. An important application of the additive property to quality testing of computer chips is presented.
On Poisson Nonlinear Transformations
Directory of Open Access Journals (Sweden)
Nasir Ganikhodjaev
2014-01-01
Full Text Available We construct the family of Poisson nonlinear transformations defined on the countable sample space of nonnegative integers and investigate their trajectory behavior. We have proved that these nonlinear transformations are regular.
Extended Poisson Exponential Distribution
Directory of Open Access Journals (Sweden)
Anum Fatima
2015-09-01
Full Text Available A new mixture of Modified Exponential (ME and Poisson distribution has been introduced in this paper. Taking the Maximum of Modified Exponential random variable when the sample size follows a zero truncated Poisson distribution we have derived the new distribution, named as Extended Poisson Exponential distribution. This distribution possesses increasing and decreasing failure rates. The Poisson-Exponential, Modified Exponential and Exponential distributions are special cases of this distribution. We have also investigated some mathematical properties of the distribution along with Information entropies and Order statistics of the distribution. The estimation of parameters has been obtained using the Maximum Likelihood Estimation procedure. Finally we have illustrated a real data application of our distribution.
Poisson branching point processes
International Nuclear Information System (INIS)
Matsuo, K.; Teich, M.C.; Saleh, B.E.A.
1984-01-01
We investigate the statistical properties of a special branching point process. The initial process is assumed to be a homogeneous Poisson point process (HPP). The initiating events at each branching stage are carried forward to the following stage. In addition, each initiating event independently contributes a nonstationary Poisson point process (whose rate is a specified function) located at that point. The additional contributions from all points of a given stage constitute a doubly stochastic Poisson point process (DSPP) whose rate is a filtered version of the initiating point process at that stage. The process studied is a generalization of a Poisson branching process in which random time delays are permitted in the generation of events. Particular attention is given to the limit in which the number of branching stages is infinite while the average number of added events per event of the previous stage is infinitesimal. In the special case when the branching is instantaneous this limit of continuous branching corresponds to the well-known Yule--Furry process with an initial Poisson population. The Poisson branching point process provides a useful description for many problems in various scientific disciplines, such as the behavior of electron multipliers, neutron chain reactions, and cosmic ray showers
Ice Lithography for Nanodevices
DEFF Research Database (Denmark)
Han, Anpan; Kuan, A.; Wang, J.
Water vapor is condensed onto a cold sample, coating it with a thin-film of ice. The ice is sensitive to electron beam lithography exposure. 10 nm ice patterns are transferred into metals by “melt-off”. Non-planar samples are coated with ice, and we pattern on cantilevers, AFM tips, and suspended...
Electron Beam Lithography for nano-patterning
DEFF Research Database (Denmark)
Greibe, Tine; Anhøj, Thomas Aarøe; Khomtchenko, Elena
2014-01-01
Electron beam lithography is a versatile tool for fabrication of nano-sized patterns. The patterns are generated by scanning a focused beam of high-energy electrons onto a substrate coated with a thin layer of electron-sensitive polymer (resist), i.e. by directly writing custom-made patterns...... in a polymer. Electron beam lithography is a suitable method for nano-sized production, research, or development of semiconductor components on a low-volume level. Here, we present electron beam lithography available at DTU Danchip. We expertize a JEOL 9500FZ with electrons accelerated to an energy of 100ke......V and focused to a beam spot size down to ~5nm. The electron beam can scan across the substrate with a speed of 100MHz and can write areas of 1mm x 1mm without stitching. In order to ensure high-precision patterning, the beam position on the substrate is controlled by a two-stage deflector system and substrates...
Development of Blue Laser Direct-Write Lithography System
Directory of Open Access Journals (Sweden)
Hao-Wen Chang
2012-01-01
Full Text Available The optical lithography system researched in this study adopted the laser direct-write lithography technology with nano-positioning stage by using retailing blue ray optical pickup head contained 405nm wavelength and 0.85 numerical aperture of focus lens as the system lighting source. The system employed a photodiode received the focusing error signal reflected by the glass substrate to identify specimen position and automatic focused control with voice coil motor. The pattern substrate was loaded on a nano-positioning stage; input pattern path automatically and collocate with inner program at the same time. This research has successfully developed a blue laser lithography process system. The single spot size can be narrowed down to 3.07 μm and the linewidth is 3.3μm, time of laser control can reach to 450 ns and the exposure pattern can be controlled by program as well.
Simulation of the effect of incline incident angle in DMD Maskless Lithography
Liang, L. W.; Zhou, J. Y.; Xiang, L. L.; Wang, B.; Wen, K. H.; Lei, L.
2017-06-01
The aim of this study is to provide a simulation method for investigation of the intensity fluctuation caused by the inclined incident angle in DMD (digital micromirror device) maskless lithography. The simulation consists of eight main processes involving the simplification of the DMD aperture function and light propagation utilizing the non-parallel angular spectrum method. These processes provide a possibility of co-simulation in the spatial frequency domain, which combines the microlens array and DMD in the maskless lithography system. The simulation provided the spot shape and illumination distribution. These two parameters are crucial in determining the exposure dose in the existing maskless lithography system.
Eliazar, Iddo; Klafter, Joseph
2008-05-01
Many random populations can be modeled as a countable set of points scattered randomly on the positive half-line. The points may represent magnitudes of earthquakes and tornados, masses of stars, market values of public companies, etc. In this article we explore a specific class of random such populations we coin ` Paretian Poisson processes'. This class is elemental in statistical physics—connecting together, in a deep and fundamental way, diverse issues including: the Poisson distribution of the Law of Small Numbers; Paretian tail statistics; the Fréchet distribution of Extreme Value Theory; the one-sided Lévy distribution of the Central Limit Theorem; scale-invariance, renormalization and fractality; resilience to random perturbations.
Evanescent interferometric lithography.
Blaikie, R J; McNab, S J
2001-04-01
Simulation results are presented to illustrate the main features of what we believe is a new photolithographic technique, evanescent interferometric lithography (EIL). The technique exploits interference between resonantly enhanced, evanescently decaying diffracted orders to create a frequency-doubled intensity pattern in the near field of a metallic diffraction grating. It is shown that the intensity in a grating's near field can be enhanced significantly compared with conventional interferometric lithography. Contrast in the interference pattern is also increased, owing to a reduction in the zeroth-order transmission near resonance. The pattern's depth of field reduces as the wavelength is increased beyond cutoff of the first-order diffracted components, and results are presented showing the trade-offs that can be made between depth of field and intensity enhancement. Examples are given for a 270-nm-period grating embedded in material with refractive index n = 1.6 and illuminated with wavelengths near 450 nm. Under these conditions it is predicted that high-intensity, high-contrast patterns with 135-nm period can be formed in photoresists more than 50 nm thick.
Plasma sources for EUV lithography exposure tools
International Nuclear Information System (INIS)
Banine, Vadim; Moors, Roel
2004-01-01
The source is an integral part of an extreme ultraviolet lithography (EUVL) tool. Such a source, as well as the EUVL tool, has to fulfil extremely high demands both technical and cost oriented. The EUVL tool operates at a wavelength in the range 13-14 nm, which requires a major re-thinking of state-of-the-art lithography systems operating in the DUV range. The light production mechanism changes from conventional lamps and lasers to relatively high temperature emitting plasmas. The light transport, mainly refractive for DUV, should become reflective for EUV. The source specifications are derived from the customer requirements for the complete tool, which are: throughput, cost of ownership (CoO) and imaging quality. The EUVL system is considered as a follow up of the existing DUV based lithography technology and, while improving the feature resolution, it has to maintain high wafer throughput performance, which is driven by the overall CoO picture. This in turn puts quite high requirements on the collectable in-band power produced by an EUV source. Increased, due to improved feature resolution, critical dimension (CD) control requirements, together with reflective optics restrictions, necessitate pulse-to-pulse repeatability, spatial stability control and repetition rates, which are substantially better than those of current optical systems. All together the following aspects of the source specification will be addressed: the operating wavelength, the EUV power, the hot spot size, the collectable angle, the repetition rate, the pulse-to-pulse repeatability and the debris induced lifetime of components
Fractional Poisson Fields and Martingales
Aletti, Giacomo; Leonenko, Nikolai; Merzbach, Ely
2018-01-01
We present new properties for the Fractional Poisson process (FPP) and the Fractional Poisson field on the plane. A martingale characterization for FPPs is given. We extend this result to Fractional Poisson fields, obtaining some other characterizations. The fractional differential equations are studied. We consider a more general Mixed-Fractional Poisson process and show that this process is the stochastic solution of a system of fractional differential-difference equations. Finally, we give some simulations of the Fractional Poisson field on the plane.
Fractional Poisson Fields and Martingales
Aletti, Giacomo; Leonenko, Nikolai; Merzbach, Ely
2018-02-01
We present new properties for the Fractional Poisson process (FPP) and the Fractional Poisson field on the plane. A martingale characterization for FPPs is given. We extend this result to Fractional Poisson fields, obtaining some other characterizations. The fractional differential equations are studied. We consider a more general Mixed-Fractional Poisson process and show that this process is the stochastic solution of a system of fractional differential-difference equations. Finally, we give some simulations of the Fractional Poisson field on the plane.
Mapper: high throughput maskless lithography
Kuiper, V.; Kampherbeek, B. J.; Wieland, M. J.; de Boer, G.; ten Berge, G. F.; Boers, J.; Jager, R.; van de Peut, T.; Peijster, J. J. M.; Slot, E.; Steenbrink, S. W. H. K.; Teepen, T. F.; van Veen, A. H. V.
2009-01-01
Maskless electron beam lithography, or electron beam direct write, has been around for a long time in the semiconductor industry and was pioneered from the mid-1960s onwards. This technique has been used for mask writing applications as well as device engineering and in some cases chip manufacturing. However because of its relatively low throughput compared to optical lithography, electron beam lithography has never been the mainstream lithography technology. To extend optical lithography double patterning, as a bridging technology, and EUV lithography are currently explored. Irrespective of the technical viability of both approaches, one thing seems clear. They will be expensive [1]. MAPPER Lithography is developing a maskless lithography technology based on massively-parallel electron-beam writing with high speed optical data transport for switching the electron beams. In this way optical columns can be made with a throughput of 10-20 wafers per hour. By clustering several of these columns together high throughputs can be realized in a small footprint. This enables a highly cost-competitive alternative to double patterning and EUV alternatives. In 2007 MAPPER obtained its Proof of Lithography milestone by exposing in its Demonstrator 45 nm half pitch structures with 110 electron beams in parallel, where all the beams where individually switched on and off [2]. In 2008 MAPPER has taken a next step in its development by building several tools. A new platform has been designed and built which contains a 300 mm wafer stage, a wafer handler and an electron beam column with 110 parallel electron beams. This manuscript describes the first patterning results with this 300 mm platform.
The Poisson aggregation process
International Nuclear Information System (INIS)
Eliazar, Iddo
2016-01-01
In this paper we introduce and analyze the Poisson Aggregation Process (PAP): a stochastic model in which a random collection of random balls is stacked over a general metric space. The scattering of the balls’ centers follows a general Poisson process over the metric space, and the balls’ radii are independent and identically distributed random variables governed by a general distribution. For each point of the metric space, the PAP counts the number of balls that are stacked over it. The PAP model is a highly versatile spatial counterpart of the temporal M/G/∞ model in queueing theory. The surface of the moon, scarred by circular meteor-impact craters, exemplifies the PAP model in two dimensions: the PAP counts the number of meteor-impacts that any given moon-surface point sustained. A comprehensive analysis of the PAP is presented, and the closed-form results established include: general statistics, stationary statistics, short-range and long-range dependencies, a Central Limit Theorem, an Extreme Limit Theorem, and fractality.
Surface enhanced thermo lithography
Coluccio, Maria Laura
2017-01-13
We used electroless deposition to fabricate clusters of silver nanoparticles (NPs) on a silicon substrate. These clusters are plasmonics devices that induce giant electromagnetic (EM) field increments. When those EM field are absorbed by the metal NPs clusters generate, in turn, severe temperature increases. Here, we used the laser radiation of a conventional Raman set-up to transfer geometrical patterns from a template of metal NPs clusters into a layer of thermo sensitive Polyphthalaldehyde (PPA) polymer. Temperature profile on the devices depends on specific arrangements of silver nanoparticles. In plane temperature variations may be controlled with (i) high nano-meter spatial precision and (ii) single Kelvin temperature resolution on varying the shape, size and spacing of metal nanostructures. This scheme can be used to generate strongly localized heat amplifications for applications in nanotechnology, surface enhanced thermo-lithography (SETL), biology and medicine (for space resolved cell ablation and treatment), nano-chemistry.
Abramova, Vera
This dissertation describes meniscus-mask lithography (MML): a planar top-down method for the fabrication of precisely positioned narrow graphene nanoribbons (GNRs) and metallic and semiconducting nanowires. The method does not require demanding high resolution lithography tools. The mechanism behind the method involves masking by atmospheric water adsorbed at the edge of the lithography pattern written on top of the target material. Chapter 1 describes the fabrication of sub-10 nm GNR from graphene sheets using MML technique. The electronic properties of resulting GNRs depend on the graphene etching method with argon reactive ion etching yielding remarkably consistent results. The influence of the most common substrates (Si/SiO2 and BN) on the electronic properties of GNRs is demonstrated. The MML technique is also shown to be applicable for fabrication of narrow metallic wires, underscoring the generality of MML for narrow features on diverse materials. In chapter 2 the MML method is shown to be effective for fabrication of narrow wires in a variety of materials. Si, SiO2, Au, Cr, W, Ti, TiO2, Al nanowires are fabricated and characterized. A wide range of materials and etching processes are used and the generality of approach suggests possible applicability of MML to a majority of materials used in modern planar technology. High reproducibility of MML method is shown and some fabrication issues specific to MML are addressed. Crossbar structures produced by MML demonstrate that junctions of nanowires could be fabricated as well, providing all the building blocks required for fabrication of nanowire structures of any complex planar geometry. Chapter 3 is focused on nanoscale menisci behavior and provides additional insights into the mechanism of MML. The width of structures formed by the MML process in concave corners is found to be much more sensitive to changes in the process than the width of MML nanowires. The possibility of change in lateral dimensions of
Poisson hierarchy of discrete strings
Energy Technology Data Exchange (ETDEWEB)
Ioannidou, Theodora, E-mail: ti3@auth.gr [Faculty of Civil Engineering, School of Engineering, Aristotle University of Thessaloniki, 54249, Thessaloniki (Greece); Niemi, Antti J., E-mail: Antti.Niemi@physics.uu.se [Department of Physics and Astronomy, Uppsala University, P.O. Box 803, S-75108, Uppsala (Sweden); Laboratoire de Mathematiques et Physique Theorique CNRS UMR 6083, Fédération Denis Poisson, Université de Tours, Parc de Grandmont, F37200, Tours (France); Department of Physics, Beijing Institute of Technology, Haidian District, Beijing 100081 (China)
2016-01-28
The Poisson geometry of a discrete string in three dimensional Euclidean space is investigated. For this the Frenet frames are converted into a spinorial representation, the discrete spinor Frenet equation is interpreted in terms of a transfer matrix formalism, and Poisson brackets are introduced in terms of the spinor components. The construction is then generalised, in a self-similar manner, into an infinite hierarchy of Poisson algebras. As an example, the classical Virasoro (Witt) algebra that determines reparametrisation diffeomorphism along a continuous string, is identified as a particular sub-algebra, in the hierarchy of the discrete string Poisson algebra. - Highlights: • Witt (classical Virasoro) algebra is derived in the case of discrete string. • Infinite dimensional hierarchy of Poisson bracket algebras is constructed for discrete strings. • Spinor representation of discrete Frenet equations is developed.
Poisson hierarchy of discrete strings
International Nuclear Information System (INIS)
Ioannidou, Theodora; Niemi, Antti J.
2016-01-01
The Poisson geometry of a discrete string in three dimensional Euclidean space is investigated. For this the Frenet frames are converted into a spinorial representation, the discrete spinor Frenet equation is interpreted in terms of a transfer matrix formalism, and Poisson brackets are introduced in terms of the spinor components. The construction is then generalised, in a self-similar manner, into an infinite hierarchy of Poisson algebras. As an example, the classical Virasoro (Witt) algebra that determines reparametrisation diffeomorphism along a continuous string, is identified as a particular sub-algebra, in the hierarchy of the discrete string Poisson algebra. - Highlights: • Witt (classical Virasoro) algebra is derived in the case of discrete string. • Infinite dimensional hierarchy of Poisson bracket algebras is constructed for discrete strings. • Spinor representation of discrete Frenet equations is developed.
Photoinhibition superresolution lithography
Forman, Darren Lawrence
While the prospect of nanoscale manufacturing has generated tremendous excitement, arbitrary patterning at nanometer length scales cannot be brought about with current photolithography---the technology that for decades has driven electronics miniaturization and enabled mass production of digital logic, memory, MEMS and flat-panel displays. This is due to the relatively long wavelength of light and diffraction, which imposes a physical not technological limit on the resolution of a far-field optical pattern. Photoinhibited superresolution (PInSR) lithography is a new scheme designed to beat the diffraction limit through two-color confinement of photopolymerization and, via efficient single-photon absorption kinetics, also be high-throughput capable. This thesis describes development of an integrated optical and materials system for investigating spatiotemporal dynamics of photoinhibited superresolution lithography, with a demonstrated 3x superresolution beyond the diffraction limit. The two-color response, arising from orthogonal photogeneration of species that participate in competing reactions, is shown to be highly complex. This is both a direct and indirect consequence of mobility. Interesting trade-offs arise: thin-film resins (necessitated by single-photon absorption kinetics) require high viscosity for film stability, but the photoinhibition effect is suppressed in viscous resins. Despite this apparent suppression, which can be overcome with high excitation of the photoinhibition system, the low mobility afforded by viscous materials is beneficial for confinement of active species. Diffusion-induced blurring of patterned photoinhibition is problematic in a resin with viscosity = 1,000 cP, and overcome in a resin with viscosity eta = 500,000 cP. Superresolution of factor 3x beyond the diffraction limit is demonstrated at 0.2 NA, with additional results indicating superresolution ability at 1.2 NA. Investigating the effect of diminished photoinhibition efficacy
Porphyrin-Based Photocatalytic Lithography
Energy Technology Data Exchange (ETDEWEB)
Bearinger, J; Stone, G; Christian, A; Dugan, L; Hiddessen, A; Wu, K J; Wu, L; Hamilton, J; Stockton, C; Hubbell, J
2007-10-15
Photocatalytic lithography is an emerging technique that couples light with coated mask materials in order to pattern surface chemistry. We excite porphyrins to create radical species that photocatalytically oxidize, and thereby pattern, chemistries in the local vicinity. The technique advantageously does not necessitate mass transport or specified substrates, it is fast and robust and the wavelength of light does not limit the resolution of patterned features. We have patterned proteins and cells in order to demonstrate the utility of photocatalytic lithography in life science applications.
Analysis on Poisson and Gamma spaces
Kondratiev, Yuri; Silva, Jose Luis; Streit, Ludwig; Us, Georgi
1999-01-01
We study the spaces of Poisson, compound Poisson and Gamma noises as special cases of a general approach to non-Gaussian white noise calculus, see \\cite{KSS96}. We use a known unitary isomorphism between Poisson and compound Poisson spaces in order to transport analytic structures from Poisson space to compound Poisson space. Finally we study a Fock type structure of chaos decomposition on Gamma space.
Coordination of Conditional Poisson Samples
Directory of Open Access Journals (Sweden)
Grafström Anton
2015-12-01
Full Text Available Sample coordination seeks to maximize or to minimize the overlap of two or more samples. The former is known as positive coordination, and the latter as negative coordination. Positive coordination is mainly used for estimation purposes and to reduce data collection costs. Negative coordination is mainly performed to diminish the response burden of the sampled units. Poisson sampling design with permanent random numbers provides an optimum coordination degree of two or more samples. The size of a Poisson sample is, however, random. Conditional Poisson (CP sampling is a modification of the classical Poisson sampling that produces a fixed-size πps sample. We introduce two methods to coordinate Conditional Poisson samples over time or simultaneously. The first one uses permanent random numbers and the list-sequential implementation of CP sampling. The second method uses a CP sample in the first selection and provides an approximate one in the second selection because the prescribed inclusion probabilities are not respected exactly. The methods are evaluated using the size of the expected sample overlap, and are compared with their competitors using Monte Carlo simulation. The new methods provide a good coordination degree of two samples, close to the performance of Poisson sampling with permanent random numbers.
... for Every Season How to Choose the Best Skin Care Products In This Section Dermatologic Surgery What is dermatologic ... for Every Season How to Choose the Best Skin Care Products Age Spots Treatment Options Learn more about treatment ...
Smartphone Sensors for Stone Lithography Authentication
Directory of Open Access Journals (Sweden)
Giuseppe Schirripa Spagnolo
2014-05-01
Full Text Available Nowadays mobile phones include quality photo and video cameras, access to wireless networks and the internet, GPS assistance and other innovative systems. These facilities open them to innovative uses, other than the classical telephonic communication one. Smartphones are a more sophisticated version of classic mobile phones, which have advanced computing power, memory and connectivity. Because fake lithographs are flooding the art market, in this work, we propose a smartphone as simple, robust and efficient sensor for lithograph authentication. When we buy an artwork object, the seller issues a certificate of authenticity, which contains specific details about the artwork itself. Unscrupulous sellers can duplicate the classic certificates of authenticity, and then use them to “authenticate” non-genuine works of art. In this way, the buyer will have a copy of an original certificate to attest that the “not original artwork” is an original one. A solution for this problem would be to insert a system that links together the certificate and the related specific artwork. To do this it is necessary, for a single artwork, to find unique, unrepeatable, and unchangeable characteristics. In this article we propose an innovative method for the authentication of stone lithographs. We use the color spots distribution captured by means of a smartphone camera as a non-cloneable texture of the specific artworks and an information management system for verifying it in mobility stone lithography.
Theoretical analysis of the potential for maskless lithography
Mack, Chris A.
2002-07-01
In order to be practical, maskless lithography schemes are limited as to how small the physical address grid can be. Thus, graybeam techniques are used to create a small virtual address grid while maintaining a large physical address grid. One important consideration for maskless lithography is the impact of these small 'virtual' address grids on image quality. Using simple simulations of aerial image formation as the summation of Gaussian spots and PROLITH simulations of the projection of square pixels, several important conclusions about the use of graybeam are made. Graybeam results in a non-linear variation in edge position with gray level, with the non-linearity increasing with larger physical address grid size. While this edge position deviation from non-linearity can be calibrated out of the writing scheme, the calibration curve is process dependent. One problem with the use of graybeam is the reduction of image quality as expressed by the image log-slope. For the raster scan case of a physical address grid equal to half of the spot size, the worst case graybeam level has an image log-slope at the edge that is 20% less than the best case. For the projection imaging case of a physical address grid equal to the pixel size, the worst case graybeam level has an image log-slope at the edge that is 15% less than the best case.
Overlay control for nanoimprint lithography
Fukuhara, Kazuya; Suzuki, Masato; Mitsuyasu, Masaki; Kono, Takuya; Nakasugi, Tetsuro; Lim, Yonghyun; Jung, Wooyung
2017-04-01
Nanoimprint lithography (NIL) is a promising technique for fine-patterning with a lower cost than other lithography techniques such as EUV or immersion with multi-patterning. NIL has the potential of "single" patterning for both line patterns and hole patterns with a half-pitch of less than 20nm. NIL tools for semiconductor manufacturing employ die-by-die alignment system with moiré fringe detection which gives alignment measurement accuracy of below 1nm. In this paper we describe the evaluation results of NIL the overlay performance using an up-to-date NIL tool for 300mm wafer. We show the progress of both "NIL-to-NIL" and "NIL-to-optical tool" distortion matching techniques. From these analyses based on actual NIL overlay data, we discuss the possibility of NIL overlay evolution to realize an on-product overlay accuracy to 3nm and beyond.
Graded geometry and Poisson reduction
Cattaneo, A S; Zambon, M
2009-01-01
The main result of [2] extends the Marsden-Ratiu reduction theorem [4] in Poisson geometry, and is proven by means of graded geometry. In this note we provide the background material about graded geometry necessary for the proof in [2]. Further, we provide an alternative algebraic proof for the main result. ©2009 American Institute of Physics
Maskless, resistless ion beam lithography
Energy Technology Data Exchange (ETDEWEB)
Ji, Qing [Univ. of California, Berkeley, CA (United States)
2003-01-01
As the dimensions of semiconductor devices are scaled down, in order to achieve higher levels of integration, optical lithography will no longer be sufficient for the needs of the semiconductor industry. Alternative next-generation lithography (NGL) approaches, such as extreme ultra-violet (EUV), X-ray, electron-beam, and ion projection lithography face some challenging issues with complicated mask technology and low throughput. Among the four major alternative NGL approaches, ion beam lithography is the only one that can provide both maskless and resistless patterning. As such, it can potentially make nano-fabrication much simpler. This thesis investigates a focused ion beam system for maskless, resistless patterning that can be made practical for high-volume production. In order to achieve maskless, resistless patterning, the ion source must be able to produce a variety of ion species. The compact FIB system being developed uses a multicusp plasma ion source, which can generate ion beams of various elements, such as O_{2}^{+}, BF_{2}^{+}, P^{+} etc., for surface modification and doping applications. With optimized source condition, around 85% of BF_{2}^{+}, over 90% of O_{2}^{+} and P^{+} have been achieved. The brightness of the multicusp-plasma ion source is a key issue for its application to maskless ion beam lithography. It can be substantially improved by optimizing the source configuration and extractor geometry. Measured brightness of 2 keV He^{+} beam is as high as 440 A/cm^{2} • Sr, which represents a 30x improvement over prior work. Direct patterning of Si thin film using a focused O_{2}^{+} ion beam has been investigated. A thin surface oxide film can be selectively formed using 3 keV O_{2}^{+} ions with the dose of 10^{15} cm^{-2}. The oxide can then serve as a hard mask for patterning of the Si film. The
Maskless, resistless ion beam lithography
International Nuclear Information System (INIS)
Ji, Qing
2003-01-01
As the dimensions of semiconductor devices are scaled down, in order to achieve higher levels of integration, optical lithography will no longer be sufficient for the needs of the semiconductor industry. Alternative next-generation lithography (NGL) approaches, such as extreme ultra-violet (EUV), X-ray, electron-beam, and ion projection lithography face some challenging issues with complicated mask technology and low throughput. Among the four major alternative NGL approaches, ion beam lithography is the only one that can provide both maskless and resistless patterning. As such, it can potentially make nano-fabrication much simpler. This thesis investigates a focused ion beam system for maskless, resistless patterning that can be made practical for high-volume production. In order to achieve maskless, resistless patterning, the ion source must be able to produce a variety of ion species. The compact FIB system being developed uses a multicusp plasma ion source, which can generate ion beams of various elements, such as O 2 + , BF 2 + , P + etc., for surface modification and doping applications. With optimized source condition, around 85% of BF 2 + , over 90% of O 2 + and P + have been achieved. The brightness of the multicusp-plasma ion source is a key issue for its application to maskless ion beam lithography. It can be substantially improved by optimizing the source configuration and extractor geometry. Measured brightness of 2 keV He + beam is as high as 440 A/cm 2 · Sr, which represents a 30x improvement over prior work. Direct patterning of Si thin film using a focused O 2 + ion beam has been investigated. A thin surface oxide film can be selectively formed using 3 keV O 2 + ions with the dose of 10 15 cm -2 . The oxide can then serve as a hard mask for patterning of the Si film. The process flow and the experimental results for directly patterned poly-Si features are presented. The formation of shallow pn-junctions in bulk silicon wafers by scanning focused P
Smith, Jason T.; Welsh, Sam J.; Farinetti, Antonio L.; Wegner, Tim; Blakeslee, James; Deboeck, Toni F.; Dyer, Daniel; Corley, Bryan M.; Ollivierre, Jarmaine; Kramer, Leonard;
2010-01-01
A Spacecraft Position Optimal Tracking (SPOT) program was developed to process Global Positioning System (GPS) data, sent via telemetry from a spacecraft, to generate accurate navigation estimates of the vehicle position and velocity (state vector) using a Kalman filter. This program uses the GPS onboard receiver measurements to sequentially calculate the vehicle state vectors and provide this information to ground flight controllers. It is the first real-time ground-based shuttle navigation application using onboard sensors. The program is compact, portable, self-contained, and can run on a variety of UNIX or Linux computers. The program has a modular objec-toriented design that supports application-specific plugins such as data corruption remediation pre-processing and remote graphics display. The Kalman filter is extensible to additional sensor types or force models. The Kalman filter design is also strong against data dropouts because it uses physical models from state and covariance propagation in the absence of data. The design of this program separates the functionalities of SPOT into six different executable processes. This allows for the individual processes to be connected in an a la carte manner, making the feature set and executable complexity of SPOT adaptable to the needs of the user. Also, these processes need not be executed on the same workstation. This allows for communications between SPOT processes executing on the same Local Area Network (LAN). Thus, SPOT can be executed in a distributed sense with the capability for a team of flight controllers to efficiently share the same trajectory information currently being computed by the program. SPOT is used in the Mission Control Center (MCC) for Space Shuttle Program (SSP) and International Space Station Program (ISSP) operations, and can also be used as a post -flight analysis tool. It is primarily used for situational awareness, and for contingency situations.
A Tubular Biomaterial Construct Exhibiting a Negative Poisson's Ratio.
Directory of Open Access Journals (Sweden)
Jin Woo Lee
Full Text Available Developing functional small-diameter vascular grafts is an important objective in tissue engineering research. In this study, we address the problem of compliance mismatch by designing and developing a 3D tubular construct that has a negative Poisson's ratio νxy (NPR. NPR constructs have the unique ability to expand transversely when pulled axially, thereby resulting in a highly-compliant tubular construct. In this work, we used projection stereolithography to 3D-print a planar NPR sheet composed of photosensitive poly(ethylene glycol diacrylate biomaterial. We used a step-lithography exposure and a stitch process to scale up the projection printing process, and used the cut-missing rib unit design to develop a centimeter-scale NPR sheet, which was rolled up to form a tubular construct. The constructs had Poisson's ratios of -0.6 ≤ νxy ≤ -0.1. The NPR construct also supports higher cellular adhesion than does the construct that has positive νxy. Our NPR design offers a significant advance in the development of highly-compliant vascular grafts.
2006-01-01
Dark spots (left) and 'fans' appear to scribble dusty hieroglyphics on top of the Martian south polar cap in two high-resolution Mars Global Surveyor, Mars Orbiter Camera images taken in southern spring. Each image is about 3-kilometers wide (2-miles).
Independent production and Poisson distribution
International Nuclear Information System (INIS)
Golokhvastov, A.I.
1994-01-01
The well-known statement of factorization of inclusive cross-sections in case of independent production of particles (or clusters, jets etc.) and the conclusion of Poisson distribution over their multiplicity arising from it do not follow from the probability theory in any way. Using accurately the theorem of the product of independent probabilities, quite different equations are obtained and no consequences relative to multiplicity distributions are obtained. 11 refs
Soft lithography for concentrator photovoltaic CPV - system's ...
African Journals Online (AJOL)
Soft lithography for concentrator photovoltaic CPV - system's application. ... Soft lithography for concentrator photovoltaic CPV - system's application. N.L. Chiromawa, K Ibrahim, M.H. Ali, U.M. Gana, A.O. Musa, N.I. Mannawi, A.A. ... Abstract. No Abstract. Keywords: Micro-Fresnel lens,Photovoltaic, Solar cells, PMMA, PDMS ...
Alternative lithography strategies for flexible electronics
Moonen, P.
2012-01-01
Main aim of the research has been the development of alternative lithography strategies for the fabrication of complex, flexible electronic devices. Flexible bottom-contact, bottom-gate thin-film transistors were solely patterned with UV nanoimprint lithography on poly(ethylene naphthalate) foil.
Chen, Kai; Rajeeva, Bharath Bangalore; Wu, Zilong; Rukavina, Michael; Dao, Thang Duy; Ishii, Satoshi; Aono, Masakazu; Nagao, Tadaaki; Zheng, Yuebing
2015-06-23
We have developed moiré nanosphere lithography (M-NSL), which incorporates in-plane rotation between neighboring monolayers, to extend the patterning capability of conventional nanosphere lithography (NSL). NSL, which uses self-assembled layers of monodisperse micro/nanospheres as masks, is a low-cost, scalable nanofabrication technique and has been widely employed to fabricate various nanoparticle arrays. Combination with dry etching and/or angled deposition has greatly enriched the family of nanoparticles NSL can yield. In this work, we introduce a variant of this technique, which uses sequential stacking of polystyrene nanosphere monolayers to form a bilayer crystal instead of conventional spontaneous self-assembly. Sequential stacking leads to the formation of moiré patterns other than the usually observed thermodynamically stable configurations. Subsequent O2 plasma etching results in a variety of complex nanostructures. Using the etched moiré patterns as masks, we have fabricated complementary gold nanostructures and studied their optical properties. We believe this facile technique provides a strategy to fabricate complex nanostructures or metasurfaces.
DNA-nanostructure-assembly by sequential spotting
Directory of Open Access Journals (Sweden)
Breitenstein Michael
2011-11-01
Full Text Available Abstract Background The ability to create nanostructures with biomolecules is one of the key elements in nanobiotechnology. One of the problems is the expensive and mostly custom made equipment which is needed for their development. We intended to reduce material costs and aimed at miniaturization of the necessary tools that are essential for nanofabrication. Thus we combined the capabilities of molecular ink lithography with DNA-self-assembling capabilities to arrange DNA in an independent array which allows addressing molecules in nanoscale dimensions. Results For the construction of DNA based nanostructures a method is presented that allows an arrangement of DNA strands in such a way that they can form a grid that only depends on the spotted pattern of the anchor molecules. An atomic force microscope (AFM has been used for molecular ink lithography to generate small spots. The sequential spotting process allows the immobilization of several different functional biomolecules with a single AFM-tip. This grid which delivers specific addresses for the prepared DNA-strand serves as a two-dimensional anchor to arrange the sequence according to the pattern. Once the DNA-nanoarray has been formed, it can be functionalized by PNA (peptide nucleic acid to incorporate advanced structures. Conclusions The production of DNA-nanoarrays is a promising task for nanobiotechnology. The described method allows convenient and low cost preparation of nanoarrays. PNA can be used for complex functionalization purposes as well as a structural element.
MAPPER: high-throughput maskless lithography
Wieland, M. J.; de Boer, G.; ten Berge, G. F.; Jager, R.; van de Peut, T.; Peijster, J. J. M.; Slot, E.; Steenbrink, S. W. H. K.; Teepen, T. F.; van Veen, A. H. V.; Kampherbeek, B. J.
2009-03-01
Maskless electron beam lithography, or electron beam direct write, has been around for a long time in the semiconductor industry and was pioneered from the mid-1960s onwards. This technique has been used for mask writing applications as well as device engineering and in some cases chip manufacturing. However because of its relatively low throughput compared to optical lithography, electron beam lithography has never been the mainstream lithography technology. To extend optical lithography double patterning, as a bridging technology, and EUV lithography are currently explored. Irrespective of the technical viability of both approaches, one thing seems clear. They will be expensive [1]. MAPPER Lithography is developing a maskless lithography technology based on massively-parallel electron-beam writing with high speed optical data transport for switching the electron beams. In this way optical columns can be made with a throughput of 10-20 wafers per hour. By clustering several of these columns together high throughputs can be realized in a small footprint. This enables a highly cost-competitive alternative to double patterning and EUV alternatives. In 2007 MAPPER obtained its Proof of Lithography milestone by exposing in its Demonstrator 45 nm half pitch structures with 110 electron beams in parallel, where all the beams where individually switched on and off [2]. In 2008 MAPPER has taken a next step in its development by building several tools. The objective of building these tools is to involve semiconductor companies to be able to verify tool performance in their own environment. To enable this, the tools will have a 300 mm wafer stage in addition to a 110-beam optics column. First exposures at 45 nm half pitch resolution have been performed and analyzed. On the same wafer it is observed that all beams print and based on analysis of 11 beams the CD for the different patterns is within 2.2 nm from target and the CD uniformity for the different patterns is better
Resistless Fabrication of Nanoimprint Lithography (NIL Stamps Using Nano-Stencil Lithography
Directory of Open Access Journals (Sweden)
Juergen Brugger
2013-10-01
Full Text Available In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the stamps reproduce the membrane aperture patterns within ±10 nm and we validate such stamps by using them to fabricate metallic nanowires down to 100 nm in size.
Directory of Open Access Journals (Sweden)
Divya Gupta
2013-01-01
Full Text Available Mongolian spots (MS are birthmarks that are present at birth and their most common location is sacrococcygeal or lumbar area. Lesions may be single or multiple and usually involve < 5% total body surface area. They are macular and round, oval or irregular in shape. The color varies from blue to greenish, gray, black or a combination of any of the above. The size varies from few to more than 20 centimetres. Pigmentation is most intense at the age of one year and gradually fades thereafter. It is rarely seen after the age of 6 years. Aberrant MS over occiput, temple, mandibular area, shoulders and limbs may be confused with other dermal melanocytoses and bruises secondary to child abuse, thus necessitating documentation at birth. Although regarded as benign, recent data suggest that MS may be associated with inborn errors of metabolism and neurocristopathies. Mongolian spots usually resolve by early childhood and hence no treatment is generally needed if they are located in the sacral area. However, sometimes it may be required for extrasacral lesions for cosmesis.
Fabrication of Pt nanowires with a diffraction-unlimited feature size by high-threshold lithography
International Nuclear Information System (INIS)
Li, Li; Zhang, Ziang; Yu, Miao; Song, Zhengxun; Weng, Zhankun; Wang, Zuobin; Li, Wenjun; Wang, Dapeng; Zhao, Le; Peng, Kuiqing
2015-01-01
Although the nanoscale world can already be observed at a diffraction-unlimited resolution using far-field optical microscopy, to make the step from microscopy to lithography still requires a suitable photoresist material system. In this letter, we consider the threshold to be a region with a width characterized by the extreme feature size obtained using a Gaussian beam spot. By narrowing such a region through improvement of the threshold sensitization to intensity in a high-threshold material system, the minimal feature size becomes smaller. By using platinum as the negative photoresist, we demonstrate that high-threshold lithography can be used to fabricate nanowire arrays with a scalable resolution along the axial direction of the linewidth from the micro- to the nanoscale using a nanosecond-pulsed laser source with a wavelength λ 0 = 1064 nm. The minimal feature size is only several nanometers (sub λ 0 /100). Compared with conventional polymer resist lithography, the advantages of high-threshold lithography are sharper pinpoints of laser intensity triggering the threshold response and also higher robustness allowing for large area exposure by a less-expensive nanosecond-pulsed laser
Parasites et parasitoses des poissons
De Kinkelin, Pierre; Morand, Marc; Hedrick, Ronald; Michel, Christian
2014-01-01
Cet ouvrage, richement illustré, offre un panorama représentatif des agents parasitaires rencontrés chez les poissons. S'appuyant sur les nouvelles conceptions de la classification phylogénétique, il met l'accent sur les propriétés biologiques, l'épidémiologie et les conséquences cliniques des groupes d'organismes en cause, à la lumière des avancées cognitives permises par les nouveaux outils de la biologie. Il est destiné à un large public, allant du monde de l'aquaculture à ceux de la santé...
Dualizing the Poisson summation formula.
Duffin, R J; Weinberger, H F
1991-01-01
If f(x) and g(x) are a Fourier cosine transform pair, then the Poisson summation formula can be written as 2sumfrominfinityn = 1g(n) + g(0) = 2sumfrominfinityn = 1f(n) + f(0). The concepts of linear transformation theory lead to the following dual of this classical relation. Let phi(x) and gamma(x) = phi(1/x)/x have absolutely convergent integrals over the positive real line. Let F(x) = sumfrominfinityn = 1phi(n/x)/x - integralinfinity0phi(t)dt and G(x) = sumfrominfinityn = 1gamma (n/x)/x - integralinfinity0 gamma(t)dt. Then F(x) and G(x) are a Fourier cosine transform pair. We term F(x) the "discrepancy" of phi because it is the error in estimating the integral phi of by its Riemann sum with the constant mesh spacing 1/x. PMID:11607208
Singular reduction of Nambu-Poisson manifolds
Das, Apurba
The version of Marsden-Ratiu Poisson reduction theorem for Nambu-Poisson manifolds by a regular foliation have been studied by Ibáñez et al. In this paper, we show that this reduction procedure can be extended to the singular case. Under a suitable notion of Hamiltonian flow on the reduced space, we show that a set of Hamiltonians on a Nambu-Poisson manifold can also be reduced.
Semiconductor foundry, lithography, and partners
Lin, Burn J.
2002-07-01
The semiconductor foundry took off in 1990 with an annual capacity of less than 0.1M 8-inch-equivalent wafers at the 2-mm node. In 2000, the annual capacity rose to more than 10M. Initially, the technology practiced at foundries was 1 to 2 generations behind that at integrated device manufacturers (IDMs). Presently, the progress in 0.13-mm manufacturing goes hand-in-hand with any of the IDMs. There is a two-order of magnitude rise in output and the progress of technology development outpaces IDMs. What are the reasons of the success? Is it possible to sustain the pace? This paper shows the quick rise of foundries in capacity, sales, and market share. It discusses the their uniqueness which gives rise to advantages in conjunction with challenges. It also shows the role foundries take with their customer partners and supplier partners, their mutual dependencies, as well as expectations. What role then does lithography play in the foundries? What are the lithographic challenges to sustain the pace of technology? The experience of technology development and transfer, at one of the major foundries, is used to illustrate the difficulties and progresses made. Looking into the future, as semiconductor manufacturing will become even more expensive and capital investment more prohibitive, we will make an attempt to suggest possible solutions.
Masks for extreme ultraviolet lithography
International Nuclear Information System (INIS)
Cardinale, G; Goldsmith, J; Kearney, P A; Larson, C; Moore, C E; Prisbrey, S; Tong, W; Vernon, S P; Weber, F; Yan, P-Y.
1998-01-01
In extreme ultraviolet lithography (EUVL), the technology specific requirements on the mask are a direct consequence of the utilization of radiation in the spectral region between 10 and 15 nm. At these wavelengths, all condensed materials are highly absorbing and efficient radiation transport mandates the use of all-reflective optical systems. Reflectivity is achieved with resonant, wavelength-matched multilayer (ML) coatings on all of the optical surfaces - including the mask. The EUV mask has a unique architecture - it consists of a substrate with a highly reflective ML coating (the mask blank) that is subsequently over-coated with a patterned absorber layer (the mask). Particulate contamination on the EUVL mask surface, errors in absorber definition and defects in the ML coating all have the potential to print in the lithographic process. While highly developed technologies exist for repair of the absorber layer, no viable strategy for the repair of ML coating defects has been identified. In this paper the state-of-the-art in ML deposition technology, optical inspection of EUVL mask blank defects and candidate absorber patterning approaches are reviewed
A Seemingly Unrelated Poisson Regression Model
King, Gary
1989-01-01
This article introduces a new estimator for the analysis of two contemporaneously correlated endogenous event count variables. This seemingly unrelated Poisson regression model (SUPREME) estimator combines the efficiencies created by single equation Poisson regression model estimators and insights from "seemingly unrelated" linear regression models.
Associative and Lie deformations of Poisson algebras
Remm, Elisabeth
2011-01-01
Considering a Poisson algebra as a non associative algebra satisfying the Markl-Remm identity, we study deformations of Poisson algebras as deformations of this non associative algebra. This gives a natural interpretation of deformations which preserves the underlying associative structure and we study deformations which preserve the underlying Lie algebra.
Constructions and classifications of projective Poisson varieties
Pym, Brent
2018-03-01
This paper is intended both as an introduction to the algebraic geometry of holomorphic Poisson brackets, and as a survey of results on the classification of projective Poisson manifolds that have been obtained in the past 20 years. It is based on the lecture series delivered by the author at the Poisson 2016 Summer School in Geneva. The paper begins with a detailed treatment of Poisson surfaces, including adjunction, ruled surfaces and blowups, and leading to a statement of the full birational classification. We then describe several constructions of Poisson threefolds, outlining the classification in the regular case, and the case of rank-one Fano threefolds (such as projective space). Following a brief introduction to the notion of Poisson subspaces, we discuss Bondal's conjecture on the dimensions of degeneracy loci on Poisson Fano manifolds. We close with a discussion of log symplectic manifolds with simple normal crossings degeneracy divisor, including a new proof of the classification in the case of rank-one Fano manifolds.
Data sharing system for lithography APC
Kawamura, Eiichi; Teranishi, Yoshiharu; Shimabara, Masanori
2007-03-01
We have developed a simple and cost-effective data sharing system between fabs for lithography advanced process control (APC). Lithography APC requires process flow, inter-layer information, history information, mask information and so on. So, inter-APC data sharing system has become necessary when lots are to be processed in multiple fabs (usually two fabs). The development cost and maintenance cost also have to be taken into account. The system handles minimum information necessary to make trend prediction for the lots. Three types of data have to be shared for precise trend prediction. First one is device information of the lots, e.g., process flow of the device and inter-layer information. Second one is mask information from mask suppliers, e.g., pattern characteristics and pattern widths. Last one is history data of the lots. Device information is electronic file and easy to handle. The electronic file is common between APCs and uploaded into the database. As for mask information sharing, mask information described in common format is obtained via Wide Area Network (WAN) from mask-vender will be stored in the mask-information data server. This information is periodically transferred to one specific lithography-APC server and compiled into the database. This lithography-APC server periodically delivers the mask-information to every other lithography-APC server. Process-history data sharing system mainly consists of function of delivering process-history data. In shipping production lots to another fab, the product-related process-history data is delivered by the lithography-APC server from the shipping site. We have confirmed the function and effectiveness of data sharing systems.
Collision prediction models using multivariate Poisson-lognormal regression.
El-Basyouny, Karim; Sayed, Tarek
2009-07-01
This paper advocates the use of multivariate Poisson-lognormal (MVPLN) regression to develop models for collision count data. The MVPLN approach presents an opportunity to incorporate the correlations across collision severity levels and their influence on safety analyses. The paper introduces a new multivariate hazardous location identification technique, which generalizes the univariate posterior probability of excess that has been commonly proposed and applied in the literature. In addition, the paper presents an alternative approach for quantifying the effect of the multivariate structure on the precision of expected collision frequency. The MVPLN approach is compared with the independent (separate) univariate Poisson-lognormal (PLN) models with respect to model inference, goodness-of-fit, identification of hot spots and precision of expected collision frequency. The MVPLN is modeled using the WinBUGS platform which facilitates computation of posterior distributions as well as providing a goodness-of-fit measure for model comparisons. The results indicate that the estimates of the extra Poisson variation parameters were considerably smaller under MVPLN leading to higher precision. The improvement in precision is due mainly to the fact that MVPLN accounts for the correlation between the latent variables representing property damage only (PDO) and injuries plus fatalities (I+F). This correlation was estimated at 0.758, which is highly significant, suggesting that higher PDO rates are associated with higher I+F rates, as the collision likelihood for both types is likely to rise due to similar deficiencies in roadway design and/or other unobserved factors. In terms of goodness-of-fit, the MVPLN model provided a superior fit than the independent univariate models. The multivariate hazardous location identification results demonstrated that some hazardous locations could be overlooked if the analysis was restricted to the univariate models.
The Poisson equation on Klein surfaces
Directory of Open Access Journals (Sweden)
Monica Rosiu
2016-04-01
Full Text Available We obtain a formula for the solution of the Poisson equation with Dirichlet boundary condition on a region of a Klein surface. This formula reveals the symmetric character of the solution.
Poisson point processes imaging, tracking, and sensing
Streit, Roy L
2010-01-01
This overview of non-homogeneous and multidimensional Poisson point processes and their applications features mathematical tools and applications from emission- and transmission-computed tomography to multiple target tracking and distributed sensor detection.
Ion beam figuring for lithography optics
Weiser, Martin
2009-05-01
Optical lithography is the key technology used for mass manufacturing of today's semiconductor devices. The tremendous development pressure in the semiconductor industry, both in time-to-market and in design quality is best illustrated by "Moore's Law" [G.E. Moore, Cramming more components on electronic circuits, Electronics 38 (1965) [1
Substrate conformal imprint lithography for nanophotonics
Verschuuren, M.A.
2010-01-01
The field of nano-photonics studies the interaction and control of light with dielectric, semiconductor and metal structures which are comparable in size or smaller than the vacuum wavelength of light. In this thesis we present Substrate Conformal Imprint Lithography (SCIL) as a novel wafer-scale
Helium ion lithography principles and performance
Drift, E. van der; Maas, D.J.
2012-01-01
Recent developments show that Scanning Helium Ion Beam Lithography (SHIBL) with a sub-nanometer beam diameter is a promising alternative fabrication technique for high-resolution nanostructures at high pattern densities. Key principles and critical conditions of the technique are explained. From
Electrostatic mask protection for extreme ultraviolet lithography
Moors, R.; Heerens, G.J.
2002-01-01
Electrostatic protection of mask for extreme ultraviolet lithography (EUVL) was discussed. Both charged and neutral particles could be prevented from moving towards the mask by choosing a nonuniform electrical field. Benefits of electrostatic protection are that it does not affect the EUV beam and
First direct-write lithography results on the Guelph high resolution proton microprobe
International Nuclear Information System (INIS)
Wang, L.P.; Kerckhove, D. de
2011-01-01
The recently completed high-resolution proton microprobe at the University of Guelph is Canada's first one-micron nuclear microprobe, which represents the country's state-of-the-art technology for various nuclear microprobe applications, e.g. direct-write microlithography. Its probe-forming system is comprised of a triplet Oxford Micro beams magnetic quadrupole lenses, along with high-precision objective slits. High energy protons coming off a 3 MV particle accelerator can achieve a nominal resolution of one micro and a beam current of several hundred of picoamperes when arriving at the target. This proton probe is ideal for the use of direct-write lithography with the incorporation of a magnetic scanning system and motorized sample stage. Preliminary lithography results have been obtained using spin-coated PMMA photoresist as specimen. The beam spot size, beam range and straggling inside the substrate and the exposure conditions are investigated by using scanning electron microscopy. This facility is the first in Canada to perform focused direct-write ion beam lithography, which is ideal for modification and machining of polymer and semiconductor materials for biological, microfluidic and ultimate lab-on-chip applications.
DEFF Research Database (Denmark)
Kaulakiene, Dalia; Thomsen, Christian; Pedersen, Torben Bach
2015-01-01
by Amazon Web Services (AWS). The users aiming for the spot market are presented with many instance types placed in multiple datacenters in the world, and thus it is difficult to choose the optimal deployment. In this paper, we propose the framework SpotADAPT (Spot-Aware (re-)Deployment of Analytical...... execution within boundaries). Moreover, during the execution of the workload, SpotADAPT suggests a redeployment if the current spot instance gets terminated by Amazon or a better deployment becomes possible due to fluctuations of the spot prices. The approach is evaluated using the actual execution times...
Estimation of Poisson noise in spatial domain
Švihlík, Jan; Fliegel, Karel; Vítek, Stanislav; Kukal, Jaromír.; Krbcová, Zuzana
2017-09-01
This paper deals with modeling of astronomical images in the spatial domain. We consider astronomical light images contaminated by the dark current which is modeled by Poisson random process. Dark frame image maps the thermally generated charge of the CCD sensor. In this paper, we solve the problem of an addition of two Poisson random variables. At first, the noise analysis of images obtained from the astronomical camera is performed. It allows estimating parameters of the Poisson probability mass functions in every pixel of the acquired dark frame. Then the resulting distributions of the light image can be found. If the distributions of the light image pixels are identified, then the denoising algorithm can be applied. The performance of the Bayesian approach in the spatial domain is compared with the direct approach based on the method of moments and the dark frame subtraction.
High order Poisson Solver for unbounded flows
DEFF Research Database (Denmark)
Hejlesen, Mads Mølholm; Rasmussen, Johannes Tophøj; Chatelain, Philippe
2015-01-01
This paper presents a high order method for solving the unbounded Poisson equation on a regular mesh using a Green’s function solution. The high order convergence was achieved by formulating mollified integration kernels, that were derived from a filter regularisation of the solution field...... the equations of fluid mechanics as an example, but can be used in many physical problems to solve the Poisson equation on a rectangular unbounded domain. For the two-dimensional case we propose an infinitely smooth test function which allows for arbitrary high order convergence. Using Gaussian smoothing....... The method was implemented on a rectangular domain using fast Fourier transforms (FFT) to increase computational efficiency. The Poisson solver was extended to directly solve the derivatives of the solution. This is achieved either by including the differential operator in the integration kernel...
Selective Contrast Adjustment by Poisson Equation
Directory of Open Access Journals (Sweden)
Ana-Belen Petro
2013-09-01
Full Text Available Poisson Image Editing is a new technique permitting to modify the gradient vector field of an image, and then to recover an image with a gradient approaching this modified gradient field. This amounts to solve a Poisson equation, an operation which can be efficiently performed by Fast Fourier Transform (FFT. This paper describes an algorithm applying this technique, with two different variants. The first variant enhances the contrast by increasing the gradient in the dark regions of the image. This method is well adapted to images with back light or strong shadows, and reveals details in the shadows. The second variant of the same Poisson technique enhances all small gradients in the image, thus also sometimes revealing details and texture.
Poisson-Jacobi reduction of homogeneous tensors
International Nuclear Information System (INIS)
Grabowski, J; Iglesias, D; Marrero, J C; Padron, E; Urbanski, P
2004-01-01
The notion of homogeneous tensors is discussed. We show that there is a one-to-one correspondence between multivector fields on a manifold M, homogeneous with respect to a vector field Δ on M, and first-order polydifferential operators on a closed submanifold N of codimension 1 such that Δ is transversal to N. This correspondence relates the Schouten-Nijenhuis bracket of multivector fields on M to the Schouten-Jacobi bracket of first-order polydifferential operators on N and generalizes the Poissonization of Jacobi manifolds. Actually, it can be viewed as a super-Poissonization. This procedure of passing from a homogeneous multivector field to a first-order polydifferential operator can also be understood as a sort of reduction; in the standard case-a half of a Poisson reduction. A dual version of the above correspondence yields in particular the correspondence between Δ-homogeneous symplectic structures on M and contact structures on N
Evaluating the double Poisson generalized linear model.
Zou, Yaotian; Geedipally, Srinivas Reddy; Lord, Dominique
2013-10-01
The objectives of this study are to: (1) examine the applicability of the double Poisson (DP) generalized linear model (GLM) for analyzing motor vehicle crash data characterized by over- and under-dispersion and (2) compare the performance of the DP GLM with the Conway-Maxwell-Poisson (COM-Poisson) GLM in terms of goodness-of-fit and theoretical soundness. The DP distribution has seldom been investigated and applied since its first introduction two decades ago. The hurdle for applying the DP is related to its normalizing constant (or multiplicative constant) which is not available in closed form. This study proposed a new method to approximate the normalizing constant of the DP with high accuracy and reliability. The DP GLM and COM-Poisson GLM were developed using two observed over-dispersed datasets and one observed under-dispersed dataset. The modeling results indicate that the DP GLM with its normalizing constant approximated by the new method can handle crash data characterized by over- and under-dispersion. Its performance is comparable to the COM-Poisson GLM in terms of goodness-of-fit (GOF), although COM-Poisson GLM provides a slightly better fit. For the over-dispersed data, the DP GLM performs similar to the NB GLM. Considering the fact that the DP GLM can be easily estimated with inexpensive computation and that it is simpler to interpret coefficients, it offers a flexible and efficient alternative for researchers to model count data. Copyright © 2013 Elsevier Ltd. All rights reserved.
Imprint lithography with degradable elastomeric polyanhydrides.
Lou, Qin; Shipp, Devon A
2012-09-26
A photocurable, degradable polyanhydride cross-linked elastomer that can be used as a stamp in imprint lithography applications has been developed. The degradable stamp materials are based on polyanhydrides synthesized using thiol-ene polymerization. In this study, curing the monomers 4-pentenoic anhydride and pentaerythritol tetrakis(3-mercaptopropionate) on a master mold yields low modulus, elastomeric, degradable polyanhydride polymer stamps that are a negative of the master. These stamps can be then used as a sacrificial template during the fabrication of a replica of the master, and can be readily degraded away from the replica using water. The resultant imprinted materials exhibited excellent uniformity over a large area. Compared with other conventional imprint lithography stamp materials, the thiol-ene polymerized polyanhydrides are degradable, master mold safe, show great release properties, have fast cure rates, are relatively low cost, and can be fabricated onto variety of substrates and materials.
Equilibrium stochastic dynamics of Poisson cluster ensembles
Directory of Open Access Journals (Sweden)
L.Bogachev
2008-06-01
Full Text Available The distribution μ of a Poisson cluster process in Χ=Rd (with n-point clusters is studied via the projection of an auxiliary Poisson measure in the space of configurations in Χn, with the intensity measure being the convolution of the background intensity (of cluster centres with the probability distribution of a generic cluster. We show that μ is quasi-invariant with respect to the group of compactly supported diffeomorphisms of Χ, and prove an integration by parts formula for μ. The corresponding equilibrium stochastic dynamics is then constructed using the method of Dirichlet forms.
White Noise of Poisson Random Measures
Proske, Frank; Øksendal, Bernt
2002-01-01
We develop a white noise theory for Poisson random measures associated with a Lévy process. The starting point of this theory is a chaos expansion with kernels of polynomial type. We use this to construct the white noise of a Poisson random measure, which takes values in a certain distribution space. Then we show, how a Skorohod/Itô integral for point processes can be represented by a Bochner integral in terms of white noise of the random measure and a Wick product. Further, we apply these co...
Bayesian regression of piecewise homogeneous Poisson processes
Directory of Open Access Journals (Sweden)
Diego Sevilla
2015-12-01
Full Text Available In this paper, a Bayesian method for piecewise regression is adapted to handle counting processes data distributed as Poisson. A numerical code in Mathematica is developed and tested analyzing simulated data. The resulting method is valuable for detecting breaking points in the count rate of time series for Poisson processes. Received: 2 November 2015, Accepted: 27 November 2015; Edited by: R. Dickman; Reviewed by: M. Hutter, Australian National University, Canberra, Australia.; DOI: http://dx.doi.org/10.4279/PIP.070018 Cite as: D J R Sevilla, Papers in Physics 7, 070018 (2015
Gallium beam lithography for superconductive structure formation
Energy Technology Data Exchange (ETDEWEB)
Henry, Michael David; Lewis, Rupert M.
2018-01-30
The present invention relates to the use of gallium beam lithography to form superconductive structures. Generally, the method includes exposing a surface to gallium to form an implanted region and then removing material adjacent to and/or below that implanted region. In particular embodiments, the methods herein provide microstructures and nanostructures in any useful substrate, such as those including niobium, tantalum, tungsten, or titanium.
Metallic resist for phase-change lithography
Zeng, Bi Jian; Huang, Jun Zhu; Ni, Ri Wen; Yu, Nian Nian; Wei, Wei; Hu, Yang Zhi; Li, Zhen; Miao, Xiang Shui
2014-06-01
Currently, the most widely used photoresists in optical lithography are organic-based resists. The major limitations of such resists include the photon accumulation severely affects the quality of photolithography patterns and the size of the pattern is constrained by the diffraction limit. Phase-change lithography, which uses semiconductor-based resists such as chalcogenide Ge2Sb2Te5 films, was developed to overcome these limitations. Here, instead of chalcogenide, we propose a metallic resist composed of Mg58Cu29Y13 alloy films, which exhibits a considerable difference in etching rate between amorphous and crystalline states. Furthermore, the heat distribution in Mg58Cu29Y13 thin film is better and can be more easily controlled than that in Ge2Sb2Te5 during exposure. We succeeded in fabricating both continuous and discrete patterns on Mg58Cu29Y13 thin films via laser irradiation and wet etching. Our results demonstrate that a metallic resist of Mg58Cu29Y13 is suitable for phase change lithography, and this type of resist has potential due to its outstanding characteristics.
Nanoimprint lithography: Review of aspects and applications
Wagner, D. J.; Jayatissa, A. H.
2005-11-01
Nanoimprint lithography is a relatively new area of study in nanotechnology. Higher resolution patterning can be achieved with nanoimprint lithography than with light diffraction or beam scattering in photoresists. Nanoimprint lithography is a generic term for nano-scale pattern transfer using embossing techniques. These techniques introduce new problems such as: nano-scale alignment, nanovoids and adhesion to the mold. The pattern is typically created in a mold using e-beam writing in photoresist on a substrate and dry etching to transfer the pattern to the mold. A low wattage dry etching process is preferred as to create as smooth a surface as possible to reduce the likelihood of polymers adhering to the mold surface. These molds are generally very durable and can be used repeatedly. Once the mold is created, an anti-sticking coating is often applied to prevent photoresist adhesion. There have been a variety of parameters used to emboss the patterns in photoresists using elevated temperature, room temperature, single and multiple layers of photoresists to name a few. This article reviews some of the current methods of creating nano-scale geometries and will include some areas of application. It will also discuss examples of achieved resolutions and the difficulties in producing them.
Regular cell design approach considering lithography-induced process variations
Gómez Fernández, Sergio
2014-01-01
The deployment delays for EUVL, forces IC design to continue using 193nm wavelength lithography with innovative and costly techniques in order to faithfully print sub-wavelength features and combat lithography induced process variations. The effect of the lithography gap in current and upcoming technologies is to cause severe distortions due to optical diffraction in the printed patterns and thus degrading manufacturing yield. Therefore, a paradigm shift in layout design is mandatory towards ...
Reverse-contact UV nanoimprint lithography for multilayered structure fabrication
DEFF Research Database (Denmark)
Kehagias, N.; Reboud, V.; Chansin, G.
2007-01-01
polymer areas are dissolved in a developer solution leaving behind the negative features of the original stamp. This method delivers resist pattern transfer without a residual layer, thereby rending unnecessary the etching steps typically needed in the imprint lithography techniques for three......In this paper, we report results on a newly developed nanofabrication technique, namely reverse-contact UV nanoimprint lithography. This technique is a combination of nanoimprint lithography and contact printing lithography. In this process, a lift-off resist and a UV cross-linkable polymer......-dimensional patterning. Three-dimensional woodpile-like structures were successfully fabricated with this new technique....
A mask manufacturer's perspective on maskless lithography
Buck, Peter; Biechler, Charles; Kalk, Franklin
2005-11-01
Maskless Lithography (ML2) is again being considered for use in mainstream CMOS IC manufacturing. Sessions at technical conferences are being devoted to ML2. A multitude of new companies have been formed in the last several years to apply new concepts to breaking the throughput barrier that has in the past prevented ML2 from achieving the cost and cycle time performance necessary to become economically viable, except in rare cases. Has Maskless Lithography's (we used to call it "Direct Write Lithography") time really come? If so, what is the expected impact on the mask manufacturer and does it matter? The lithography tools used today in mask manufacturing are similar in concept to ML2 except for scale, both in throughput and feature size. These mask tools produce highly accurate lithographic images directly from electronic pattern files, perform multi-layer overlay, and mix-n-match across multiple tools, tool types and sites. Mask manufacturers are already accustomed to the ultimate low volume - one substrate per design layer. In order to achieve the economically required throughput, proposed ML2 systems eliminate or greatly reduce some of the functions that are the source of the mask writer's accuracy. Can these ML2 systems meet the demanding lithographic requirements without these functions? ML2 may eliminate the reticle but many of the processes and procedures performed today by the mask manufacturer are still required. Examples include the increasingly complex mask data preparation step and the verification performed to ensure that the pattern on the reticle is accurately representing the design intent. The error sources that are fixed on a reticle are variable with time on an ML2 system. It has been proposed that if ML2 is successful it will become uneconomical to be in the mask business - that ML2, by taking the high profit masks will take all profitability out of mask manufacturing and thereby endanger the entire semiconductor industry. Others suggest that a
Spatial Nonhomogeneous Poisson Process in Corrosion Management
López De La Cruz, J.; Kuniewski, S.P.; Van Noortwijk, J.M.; Guriérrez, M.A.
2008-01-01
A method to test the assumption of nonhomogeneous Poisson point processes is implemented to analyze corrosion pit patterns. The method is calibrated with three artificially generated patterns and manages to accurately assess whether a pattern distribution is random, regular, or clustered. The
Efficient information transfer by Poisson neurons
Czech Academy of Sciences Publication Activity Database
Košťál, Lubomír; Shinomoto, S.
2016-01-01
Roč. 13, č. 3 (2016), s. 509-520 ISSN 1547-1063 R&D Projects: GA ČR(CZ) GA15-08066S Institutional support: RVO:67985823 Keywords : information capacity * Poisson neuron * metabolic cost * decoding error Subject RIV: BD - Theory of Information Impact factor: 1.035, year: 2016
Natural Poisson structures of nonlinear plasma dynamics
International Nuclear Information System (INIS)
Kaufman, A.N.
1982-06-01
Hamiltonian field theories, for models of nonlinear plasma dynamics, require a Poisson bracket structure for functionals of the field variables. These are presented, applied, and derived for several sets of field variables: coherent waves, incoherent waves, particle distributions, and multifluid electrodynamics. Parametric coupling of waves and plasma yields concise expressions for ponderomotive effects (in kinetic and fluid models) and for induced scattering
Natural Poisson structures of nonlinear plasma dynamics
International Nuclear Information System (INIS)
Kaufman, A.N.
1982-01-01
Hamiltonian field theories, for models of nonlinear plasma dynamics, require a Poisson bracket structure for functionals of the field variables. These are presented, applied, and derived for several sets of field variables: coherent waves, incoherent waves, particle distributions, and multifluid electrodynamics. Parametric coupling of waves and plasma yields concise expressions for ponderomotive effects (in kinetic and fluid models) and for induced scattering. (Auth.)
Poisson brackets for fluids and plasmas
International Nuclear Information System (INIS)
Morrison, P.J.
1982-01-01
Noncanonical yet Hamiltonian descriptions are presented of many of the non-dissipative field equations that govern fluids and plasmas. The dynamical variables are the usually encountered physical variables. These descriptions have the advantage that gauge conditions are absent, but at the expense of introducing peculiar Poisson brackets. Clebsch-like potential descriptions that reverse this situations are also introduced
Almost Poisson integration of rigid body systems
International Nuclear Information System (INIS)
Austin, M.A.; Krishnaprasad, P.S.; Li-Sheng Wang
1993-01-01
In this paper we discuss the numerical integration of Lie-Poisson systems using the mid-point rule. Since such systems result from the reduction of hamiltonian systems with symmetry by lie group actions, we also present examples of reconstruction rules for the full dynamics. A primary motivation is to preserve in the integration process, various conserved quantities of the original dynamics. A main result of this paper is an O(h 3 ) error estimate for the Lie-Poisson structure, where h is the integration step-size. We note that Lie-Poisson systems appear naturally in many areas of physical science and engineering, including theoretical mechanics of fluids and plasmas, satellite dynamics, and polarization dynamics. In the present paper we consider a series of progressively complicated examples related to rigid body systems. We also consider a dissipative example associated to a Lie-Poisson system. The behavior of the mid-point rule and an associated reconstruction rule is numerically explored. 24 refs., 9 figs
Dimensional reduction for generalized Poisson brackets
Acatrinei, Ciprian Sorin
2008-02-01
We discuss dimensional reduction for Hamiltonian systems which possess nonconstant Poisson brackets between pairs of coordinates and between pairs of momenta. The associated Jacobi identities imply that the dimensionally reduced brackets are always constant. Some examples are given alongside the general theory.
Affine Poisson Groups and WZW Model
Directory of Open Access Journals (Sweden)
Ctirad Klimcík
2008-01-01
Full Text Available We give a detailed description of a dynamical system which enjoys a Poisson-Lie symmetry with two non-isomorphic dual groups. The system is obtained by taking the q → ∞ limit of the q-deformed WZW model and the understanding of its symmetry structure results in uncovering an interesting duality of its exchange relations.
A generalized Poisson and Poisson-Boltzmann solver for electrostatic environments
Energy Technology Data Exchange (ETDEWEB)
Fisicaro, G., E-mail: giuseppe.fisicaro@unibas.ch; Goedecker, S. [Department of Physics, University of Basel, Klingelbergstrasse 82, 4056 Basel (Switzerland); Genovese, L. [University of Grenoble Alpes, CEA, INAC-SP2M, L-Sim, F-38000 Grenoble (France); Andreussi, O. [Institute of Computational Science, Università della Svizzera Italiana, Via Giuseppe Buffi 13, CH-6904 Lugano (Switzerland); Theory and Simulations of Materials (THEOS) and National Centre for Computational Design and Discovery of Novel Materials (MARVEL), École Polytechnique Fédérale de Lausanne, Station 12, CH-1015 Lausanne (Switzerland); Marzari, N. [Theory and Simulations of Materials (THEOS) and National Centre for Computational Design and Discovery of Novel Materials (MARVEL), École Polytechnique Fédérale de Lausanne, Station 12, CH-1015 Lausanne (Switzerland)
2016-01-07
The computational study of chemical reactions in complex, wet environments is critical for applications in many fields. It is often essential to study chemical reactions in the presence of applied electrochemical potentials, taking into account the non-trivial electrostatic screening coming from the solvent and the electrolytes. As a consequence, the electrostatic potential has to be found by solving the generalized Poisson and the Poisson-Boltzmann equations for neutral and ionic solutions, respectively. In the present work, solvers for both problems have been developed. A preconditioned conjugate gradient method has been implemented for the solution of the generalized Poisson equation and the linear regime of the Poisson-Boltzmann, allowing to solve iteratively the minimization problem with some ten iterations of the ordinary Poisson equation solver. In addition, a self-consistent procedure enables us to solve the non-linear Poisson-Boltzmann problem. Both solvers exhibit very high accuracy and parallel efficiency and allow for the treatment of periodic, free, and slab boundary conditions. The solver has been integrated into the BigDFT and Quantum-ESPRESSO electronic-structure packages and will be released as an independent program, suitable for integration in other codes.
A generalized Poisson and Poisson-Boltzmann solver for electrostatic environments
International Nuclear Information System (INIS)
Fisicaro, G.; Goedecker, S.; Genovese, L.; Andreussi, O.; Marzari, N.
2016-01-01
The computational study of chemical reactions in complex, wet environments is critical for applications in many fields. It is often essential to study chemical reactions in the presence of applied electrochemical potentials, taking into account the non-trivial electrostatic screening coming from the solvent and the electrolytes. As a consequence, the electrostatic potential has to be found by solving the generalized Poisson and the Poisson-Boltzmann equations for neutral and ionic solutions, respectively. In the present work, solvers for both problems have been developed. A preconditioned conjugate gradient method has been implemented for the solution of the generalized Poisson equation and the linear regime of the Poisson-Boltzmann, allowing to solve iteratively the minimization problem with some ten iterations of the ordinary Poisson equation solver. In addition, a self-consistent procedure enables us to solve the non-linear Poisson-Boltzmann problem. Both solvers exhibit very high accuracy and parallel efficiency and allow for the treatment of periodic, free, and slab boundary conditions. The solver has been integrated into the BigDFT and Quantum-ESPRESSO electronic-structure packages and will be released as an independent program, suitable for integration in other codes
EUV lithography imaging using novel pellicle membranes
Pollentier, Ivan; Vanpaemel, Johannes; Lee, Jae Uk; Adelmann, Christoph; Zahedmanesh, Houman; Huyghebaert, Cedric; Gallagher, Emily E.
2016-03-01
EUV mask protection against defects during use remains a challenge for EUV lithography. A stand-off protective membrane - a pellicle - is targeted to prevent yield losses in high volume manufacturing during handling and exposure, just as it is for 193nm lithography. The pellicle is thin enough to transmit EUV exposure light, yet strong enough to remain intact and hold any particles out of focus during exposure. The development of pellicles for EUV is much more challenging than for 193nm lithography for multiple reasons including: high absorption of most materials at EUV wavelength, pump-down sequences in the EUV vacuum system, and exposure to high intensity EUV light. To solve the problems of transmission and film durability, various options have been explored. In most cases a thin core film is considered, since the deposition process for this is well established and because it is the simplest option. The transmission specification typically dictates that membranes are very thin (~50nm or less), which makes both fabrication and film mechanical integrity difficult. As an alternative, low density films (e.g. including porosity) will allow thicker membranes for a given transmission specification, which is likely to improve film durability. The risk is that the porosity could influence the imaging. At imec, two cases of pellicle concepts based on reducing density have been assessed : (1) 3D-patterned SiN by directed self-assembly (DSA), and (2) carbon nanomaterials such as carbon nanotubes (CNT) and carbon nanosheets (CNS). The first case is based on SiN membranes that are 3D-patterned by Directed Self Assembly (DSA). The materials are tested relative to the primary specifications: EUV transmission and film durability. A risk assessment of printing performance is provided based on simulations of scattered energy. General conclusions on the efficacy of various approaches will provided.
Image-projection ion-beam lithography
International Nuclear Information System (INIS)
Miller, P.A.
1989-01-01
Image-projection ion-beam lithography is an attractive alternative for submicron patterning because it may provide high throughput; it uses demagnification to gain advantages in reticle fabrication, inspection, and lifetime; and it enjoys the precise deposition characteristics of ions which cause essentially no collateral damage. This lithographic option involves extracting low-mass ions (e.g., He + ) from a plasma source, transmitting the ions at low voltage through a stencil reticle, and then accelerating and focusing the ions electrostatically onto a resist-coated wafer. While the advantages of this technology have been demonstrated experimentally by the work of IMS (Austria), many difficulties still impede extension of the technology to the high-volume production of microelectronic devices. We report a computational study of a lithography system designed to address problem areas in field size, telecentricity, and chromatic and geometric aberration. We present a novel ion-column-design approach and conceptual ion-source and column designs which address these issues. We find that image-projection ion-beam technology should in principle meet high-volume-production requirements. The technical success of our present relatively compact-column design requires that a glow-discharge-based ion source (or equivalent cold source) be developed and that moderate further improvement in geometric aberration levels be obtained. Our system requires that image predistortion be employed during reticle fabrication to overcome distortion due to residual image nonlinearity and space-charge forces. This constitutes a software data preparation step, as do correcting for distortions in electron lithography columns and performing proximity-effect corrections. Areas needing further fundamental work are identified
Functionalized SU-8 patterned with X-ray Lithography
DEFF Research Database (Denmark)
Balslev, Søren; Romanato, F.
2005-01-01
In this work we demonstrate the feasibility of x-ray lithography on SU-8 photoresist doped with the laser dye Rhodamine 6G, while retaining the photoactive properties of the embedded dye. Two kinds of structures are fabricated via soft x-ray lithography and characterized: a laser and in amplified...
3D Nanofabrication of fluidic components by corner lithography
Burouni, N.
2014-01-01
A reproducible wafer-scale method to obtain 3D nanostructures using a low-budget lithography tool is investigated. This method, called corner lithography, explores the conformal deposition and the subsequent timed isotropic etching of a thin film in a 3D shaped silicon template. Moreover, it offers
Bragg reflectors with IR suppression for Extreme Ultraviolet Lithography
Medvedev, Viacheslav; Yakshin, Andrey; van de Kruijs, Robbert Wilhelmus Elisabeth; Krivtsun, V.M.; Yakunin, A.M.; Koshelev, K.; Bijkerk, Frederik
2012-01-01
The most promi¬sing next generation lithography technology is extreme ultraviolet lithography (EUVL). To fulfill the demands of high productivity, EUVL requires high power EUV radiation sources, with a promising technology for such sources being based on the emission of dense plasmas produced by
Thermoplastic microcantilevers fabricated by nanoimprint lithography
DEFF Research Database (Denmark)
Greve, Anders; Keller, Stephan Urs; Vig, Asger Laurberg
2010-01-01
Nanoimprint lithography has been exploited to fabricate micrometre-sized cantilevers in thermoplastic. This technique allows for very well defined microcantilevers and gives the possibility of embedding structures into the cantilever surface. The microcantilevers are fabricated in TOPAS and are up...... to 500 μm long, 100 μm wide, and 4.5 μm thick. Some of the cantilevers have built-in ripple surface structures with heights of 800 nm and pitches of 4 μm. The yield for the cantilever fabrication is 95% and the initial out-of-plane bending is below 10 μm. The stiffness of the cantilevers is measured...
A simple electron-beam lithography system
DEFF Research Database (Denmark)
Mølhave, Kristian; Madsen, Dorte Nørgaard; Bøggild, Peter
2005-01-01
A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit...... of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50 x 50 pm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10 run. We demonstrate how the EBL system can...
Fabrication of biopolymer cantilevers using nanoimprint lithography
DEFF Research Database (Denmark)
Keller, Stephan Sylvest; Feidenhans'l, Nikolaj Agentoft; Fisker-Bødker, Nis
2011-01-01
The biodegradable polymer poly(l-lactide) (PLLA) was introduced for the fabrication of micromechanical devices. For this purpose, thin biopolymer films with thickness around 10 μm were spin-coated on silicon substrates. Patterning of microcantilevers is achieved by nanoimprint lithography. A major...... challenge was the high adhesion between PLLA and silicon stamp. Optimized stamp fabrication and the deposition of a 125 nm thick fluorocarbon anti-stiction coating on the PLLA allowed the fabrication of biopolymer cantilevers. Resonance frequency measurements were used to estimate the Young’s modulus...
Linear odd Poisson bracket on Grassmann variables
International Nuclear Information System (INIS)
Soroka, V.A.
1999-01-01
A linear odd Poisson bracket (antibracket) realized solely in terms of Grassmann variables is suggested. It is revealed that the bracket, which corresponds to a semi-simple Lie group, has at once three Grassmann-odd nilpotent Δ-like differential operators of the first, the second and the third orders with respect to Grassmann derivatives, in contrast with the canonical odd Poisson bracket having the only Grassmann-odd nilpotent differential Δ-operator of the second order. It is shown that these Δ-like operators together with a Grassmann-odd nilpotent Casimir function of this bracket form a finite-dimensional Lie superalgebra. (Copyright (c) 1999 Elsevier Science B.V., Amsterdam. All rights reserved.)
Mack, Chris A.
2001-09-01
GHOST uses two exposures, the primary dose and its complement, in an attempt to equalize the effects of backscattering and reduce proximity effects. Unfortunately, image contrast is reduced compared to exposures done without GHOST. A simplified raster scan theory is developed in order to examine the effects of backscattering and GHOST proximity correction on the quality of the images produced. Electron beam lithography simulation is used to examine the effect of spot size and voltage on the spot image generated in 400 nm of ZEP 7000 resist, and the effects of GHOST on proximity effects and process latitude.
Degenerate odd Poisson bracket on Grassmann variables
International Nuclear Information System (INIS)
Soroka, V.A.
2000-01-01
A linear degenerate odd Poisson bracket (antibracket) realized solely on Grassmann variables is proposed. It is revealed that this bracket has at once three Grassmann-odd nilpotent Δ-like differential operators of the first, second and third orders with respect to the Grassmann derivatives. It is shown that these Δ-like operators, together with the Grassmann-odd nilpotent Casimir function of this bracket, form a finite-dimensional Lie superalgebra
Poisson/Superfish codes for personal computers
International Nuclear Information System (INIS)
Humphries, S.
1992-01-01
The Poisson/Superfish codes calculate static E or B fields in two-dimensions and electromagnetic fields in resonant structures. New versions for 386/486 PCs and Macintosh computers have capabilities that exceed the mainframe versions. Notable improvements are interactive graphical post-processors, improved field calculation routines, and a new program for charged particle orbit tracking. (author). 4 refs., 1 tab., figs
Elementary derivation of Poisson structures for fluid dynamics and electrodynamics
International Nuclear Information System (INIS)
Kaufman, A.N.
1982-01-01
The canonical Poisson structure of the microscopic Lagrangian is used to deduce the noncanonical Poisson structure for the macroscopic Hamiltonian dynamics of a compressible neutral fluid and of fluid electrodynamics
METHOD OF FOREST FIRES PROBABILITY ASSESSMENT WITH POISSON LAW
Directory of Open Access Journals (Sweden)
A. S. Plotnikova
2016-01-01
Full Text Available The article describes the method for the forest fire burn probability estimation on a base of Poisson distribution. The λ parameter is assumed to be a mean daily number of fires detected for each Forest Fire Danger Index class within specific period of time. Thus, λ was calculated for spring, summer and autumn seasons separately. Multi-annual daily Forest Fire Danger Index values together with EO-derived hot spot map were input data for the statistical analysis. The major result of the study is generation of the database on forest fire burn probability. Results were validated against EO daily data on forest fires detected over Irkutsk oblast in 2013. Daily weighted average probability was shown to be linked with the daily number of detected forest fires. Meanwhile, there was found a number of fires which were developed when estimated probability was low. The possible explanation of this phenomenon was provided.
Poisson Plus Quantification for Digital PCR Systems.
Majumdar, Nivedita; Banerjee, Swapnonil; Pallas, Michael; Wessel, Thomas; Hegerich, Patricia
2017-08-29
Digital PCR, a state-of-the-art nucleic acid quantification technique, works by spreading the target material across a large number of partitions. The average number of molecules per partition is estimated using Poisson statistics, and then converted into concentration by dividing by partition volume. In this standard approach, identical partition sizing is assumed. Violations of this assumption result in underestimation of target quantity, when using Poisson modeling, especially at higher concentrations. The Poisson-Plus Model accommodates for this underestimation, if statistics of the volume variation are well characterized. The volume variation was measured on the chip array based QuantStudio 3D Digital PCR System using the ROX fluorescence level as a proxy for effective load volume per through-hole. Monte Carlo simulations demonstrate the efficacy of the proposed correction. Empirical measurement of model parameters characterizing the effective load volume on QuantStudio 3D Digital PCR chips is presented. The model was used to analyze digital PCR experiments and showed improved accuracy in quantification. At the higher concentrations, the modeling must take effective fill volume variation into account to produce accurate estimates. The extent of the difference from the standard to the new modeling is positively correlated to the extent of fill volume variation in the effective load of your reactions.
Reduction of Nambu-Poisson Manifolds by Regular Distributions
Das, Apurba
2018-03-01
The version of Marsden-Ratiu reduction theorem for Nambu-Poisson manifolds by a regular distribution has been studied by Ibáñez et al. In this paper we show that the reduction is always ensured unless the distribution is zero. Next we extend the more general Falceto-Zambon Poisson reduction theorem for Nambu-Poisson manifolds. Finally, we define gauge transformations of Nambu-Poisson structures and show that these transformations commute with the reduction procedure.
Pattern-integrated interference lithography instrumentation.
Burrow, G M; Leibovici, M C R; Kummer, J W; Gaylord, T K
2012-06-01
Multi-beam interference (MBI) provides the ability to form a wide range of sub-micron periodic optical-intensity distributions with applications to a variety of areas, including photonic crystals (PCs), nanoelectronics, biomedical structures, optical trapping, metamaterials, and numerous subwavelength structures. Recently, pattern-integrated interference lithography (PIIL) was presented as a new lithographic method that integrates superposed pattern imaging with interference lithography in a single-exposure step. In the present work, the basic design and systematic implementation of a pattern-integrated interference exposure system (PIIES) is presented to realize PIIL by incorporating a projection imaging capability in a novel three-beam interference configuration. A fundamental optimization methodology is presented to model the system and predict MBI-patterning performance. To demonstrate the PIIL method, a prototype PIIES experimental configuration is presented, including detailed alignment techniques and experimental procedures. Examples of well-defined PC structures, fabricated with a PIIES prototype, are presented to demonstrate the potential of PIIL for fabricating dense integrated optical circuits, as well as numerous other subwavelength structures.
X-ray lithography: Beamline U6
Silverman, J. P.; Haelbich, R. P.; Warlaumont, J. M.
Over the last decade there have been remarkable advances in the manufacture of integrated circuits. In 1974, the smallest features being replicated in production were about 4.0 microns wide; by now (1984) they have shrunk to 1.0 microns wide. At this size, however, it has become increasingly difficult to progress to smaller features because of the blurring caused by diffraction of the UV light used to expose the photoresist on the silicon wafers. Although there are techniques being developed to extend conventional optical lithography to smaller dimensions, they are difficult and costly. An alternative approach is to use X-rays, which, because of their much shorter wavelength, promise better resolution than can be obtained by todays's methods. The primary goal of this effort is to develop a system to use synchrotron radiation for X-ray lithography. Synchrotron radiation has two major advantages over conventional X-ray sources: the radiation is collimated, and it is orders of magnitude more intense. It is believed that a storage ring source will allow the best possible resolution with reasonable throughput.
International Nuclear Information System (INIS)
Colhoun, C.
1982-01-01
The spot market is always quoted for the price of uranium because little information is available about long-term contracts. A review of the development of spot market prices shows the same price curve swings that occur with all raw materials. Future long-term contracts will probably be lower to reflect spot market prices, which are currently in the real-value range of $30-$35. An upswing in the price of uranium could come in the next few months as utilities begin making purchases and trading from stockpiles. The US, unlike Europe and Japan, has already reached a supply and demand point where the spot market share is increasing. Forecasters cannot project the market price, they can only predict the presence of an oscillating spot or a secondary market. 5 figures
Maskless beam pen lithography based on integrated microlens array and spatial-filter array
Hasan, Md. Nazmul; Dinh, Duc-Hanh; Chien, Hung-Liang; Lee, Yung-Chun
2017-11-01
A beam pen lithography system is proposed for ultraviolet (UV) patterning of complicated patterns in a maskless manner. The system consists of a single UV light-emitting diode (LED), a double-sided microlens/spatial-filter array (MLSFA), and a motorized x-y stage. The double-sided MLSFA contains a pinhole array sandwiched by two microlens arrays. The microlens arrays are fabricated by an excimer laser micromachining system to achieve accurate and optimized lens profiles obtained from optical simulation. Techniques have been developed in the fabrication processes to guarantee good alignment between the pinhole array and the two microlens arrays. Finally, arrayed UV spots are formed with feature size around 4 to 5 μm. Through mechanical movement of stage and intensity control on the UV LED, a number of complicated patterns are experimentally demonstrated using this type of beam pen lithography. It offers a simple, inexpensive, and portable choice on maskless UV patterning with great potential for future applications.
Innovative SU-8 Lithography Techniques and Their Applications
Directory of Open Access Journals (Sweden)
Jeong Bong Lee
2014-12-01
Full Text Available SU-8 has been widely used in a variety of applications for creating structures in micro-scale as well as sub-micron scales for more than 15 years. One of the most common structures made of SU-8 is tall (up to millimeters high-aspect-ratio (up to 100:1 3D microstructure, which is far better than that made of any other photoresists. There has been a great deal of efforts in developing innovative unconventional lithography techniques to fully utilize the thick high aspect ratio nature of the SU-8 photoresist. Those unconventional lithography techniques include inclined ultraviolet (UV exposure, back-side UV exposure, drawing lithography, and moving-mask UV lithography. In addition, since SU-8 is a negative-tone photoresist, it has been a popular choice of material for multiple-photon interference lithography for the periodic structure in scales down to deep sub-microns such as photonic crystals. These innovative lithography techniques for SU-8 have led to a lot of unprecedented capabilities for creating unique micro- and nano-structures. This paper reviews such innovative lithography techniques developed in the past 15 years or so.
Analysis of overdispersed count data by mixtures of Poisson variables and Poisson processes.
Hougaard, P; Lee, M L; Whitmore, G A
1997-12-01
Count data often show overdispersion compared to the Poisson distribution. Overdispersion is typically modeled by a random effect for the mean, based on the gamma distribution, leading to the negative binomial distribution for the count. This paper considers a larger family of mixture distributions, including the inverse Gaussian mixture distribution. It is demonstrated that it gives a significantly better fit for a data set on the frequency of epileptic seizures. The same approach can be used to generate counting processes from Poisson processes, where the rate or the time is random. A random rate corresponds to variation between patients, whereas a random time corresponds to variation within patients.
Algebraic properties of compatible Poisson brackets
Zhang, Pumei
2014-05-01
We discuss algebraic properties of a pencil generated by two compatible Poisson tensors A( x) and B( x). From the algebraic viewpoint this amounts to studying the properties of a pair of skew-symmetric bilinear forms A and B defined on a finite-dimensional vector space. We describe the Lie group G P of linear automorphisms of the pencil P = { A + λB}. In particular, we obtain an explicit formula for the dimension of G P and discuss some other algebraic properties such as solvability and Levi-Malcev decomposition.
Lithography trends based on projections of the ITRS (Invited Paper)
Arden, Wolfgang
2005-06-01
The microelectronic industry has gone through an enormous technical evolution in the last four decades. Both the tech-nological and economic challenges of microelectronics were increasing consistently in the past few years. This paper discusses the future trends in micro- and nano-technologies with special emphasis on lithography. The trends of minia-turization will be sketched with reference to the International Technology Roadmap for Semiconductors (ITRS). After a description of general trends in technology node timing, an overview will be given on the future lithography require-ments and the technical solutions including options for post-optical lithography as, for example, Extreme UV.
Workshop on compact storage ring technology: applications to lithography
International Nuclear Information System (INIS)
1986-01-01
Project planning in the area of x-ray lithography is discussed. Three technologies that are emphasized are the light source, the lithographic technology, and masking technology. The needs of the semiconductor industry in the lithography area during the next decade are discussed, particularly as regards large scale production of high density dynamic random access memory devices. Storage ring parameters and an overall exposure tool for x-ray lithography are addressed. Competition in this area of technology from Germany and Japan is discussed briefly. The design of a storage ring is considered, including lattice design, magnets, and beam injection systems
Photonic integrated circuits: new challenges for lithography
Bolten, Jens; Wahlbrink, Thorsten; Prinzen, Andreas; Porschatis, Caroline; Lerch, Holger; Giesecke, Anna Lena
2016-10-01
In this work routes towards the fabrication of photonic integrated circuits (PICs) and the challenges their fabrication poses on lithography, such as large differences in feature dimension of adjacent device features, non-Manhattan-type features, high aspect ratios and significant topographic steps as well as tight lithographic requirements with respect to critical dimension control, line edge roughness and other key figures of merit not only for very small but also for relatively large features, are highlighted. Several ways those challenges are faced in today's low-volume fabrication of PICs, including the concept multi project wafer runs and mix and match approaches, are presented and possible paths towards a real market uptake of PICs are discussed.
A simple electron-beam lithography system
International Nuclear Information System (INIS)
Moelhave, Kristian; Madsen, Dorte Noergaard; Boeggild, Peter
2005-01-01
A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50x50 μm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10 nm. We demonstrate how the EBL system can be used to write three-dimensional nanostructures by electron-beam deposition
Illumination system for X-ray lithography
International Nuclear Information System (INIS)
Buckley, W.D.
1989-01-01
An X-ray lithography system is described, comprising: a point source of X-Ray radiation; a wafer plane disposed in spaced relation to the point source of X-Ray radiation; a mask disposed between the point source of X-Ray radiation and the wafer plane whereby X-Ray radiation from the point source of X-ray radiation passes through the mask to the water plane; and X-Ray absorbent means mounted between the point source of X-Ray radiation and the wafer plane, the X-Ray absorbent means being of quadratically absorption from maximum absorption at the center to minimum absorption at the edge so as to have a radial absorption gradient profile to compensate for radial flux variation of the X-Ray radiation
Recent advances in X-ray lithography
International Nuclear Information System (INIS)
Cerrina, F.
1992-01-01
We report some significant developments in the area of X-ray technology, in the area of the modeling of image formation, in distortion control and in mask replication. Early simple models have been replaced by complete optical calculations based on physical optics and including all relevant factors. These models provide good agreement with the available experimental results. In the area of mask distortions, the use of finite element analysis models has clarified the roles played by the various sources of stress and explained in greater detail the origin of temperature changes. These progress have paved the way to the optimization of the exposure system and to the achievement of the large exposure latitude potential of X-ray lithography. (author)
Direct optical lithography of functional inorganic nanomaterials
Wang, Yuanyuan; Fedin, Igor; Zhang, Hao; Talapin, Dmitri V.
2017-07-01
Photolithography is an important manufacturing process that relies on using photoresists, typically polymer formulations, that change solubility when illuminated with ultraviolet light. Here, we introduce a general chemical approach for photoresist-free, direct optical lithography of functional inorganic nanomaterials. The patterned materials can be metals, semiconductors, oxides, magnetic, or rare earth compositions. No organic impurities are present in the patterned layers, which helps achieve good electronic and optical properties. The conductivity, carrier mobility, dielectric, and luminescence properties of optically patterned layers are on par with the properties of state-of-the-art solution-processed materials. The ability to directly pattern all-inorganic layers by using a light exposure dose comparable with that of organic photoresists provides an alternate route for thin-film device manufacturing.
Single-mask double-patterning lithography
Ghaida, Rani S.; Torres, George; Gupta, Puneet
2009-10-01
This paper proposes shift-trim double patterning lithography (ST-DPL), a cost-effective method for achieving 2× pitchrelaxation with a single photomask (especially at polysilicon layer). The mask is re-used for the second exposure by applying a translational mask-shift. Extra printed features are then removed using a non-critical trim exposure. The viability of ST-DPL is demonstrated. The proposed method has many advantages with virtually no area overhead (DPL, (2) reduces overlay errors between the two patterns and can virtually eliminate it in some process implementations, (3) alleviates the bimodal problem in doublepatterning, and (4) enhances throughput of first-rate scanners. We implement a small 45nm standard-cell library and small benchmark designs with ST-DPL to illustrate its viability.
Inclined nanoimprinting lithography for 3D nanopatterning
International Nuclear Information System (INIS)
Liu Zhan; Bucknall, David G; Allen, Mark G
2011-01-01
We report a non-conventional shear-force-driven nanofabrication approach, inclined nanoimprint lithography (INIL), for producing 3D nanostructures of varying heights on planar substrates in a single imprinting step. Such 3D nanostructures are fabricated by exploiting polymer anisotropic dewetting where the degree of anisotropy can be controlled by the magnitude of the inclination angle. The feature size is reduced from micron scale of the template to a resultant nanoscale pattern. The underlying INIL mechanism is investigated both experimentally and theoretically. The results indicate that the shear force generated at a non-zero inclination angle induced by the INIL apparatus essentially leads to asymmetry in the polymer flow direction ultimately resulting in 3D nanopatterns with different heights. INIL removes the requirements in conventional nanolithography of either utilizing 3D templates or using multiple lithographic steps. This technique enables various 3D nanoscale devices including angle-resolved photonic and plasmonic crystals to be fabricated.
Monospot test; Heterophile antibody test; Heterophile agglutination test; Paul-Bunnell test; Forssman antibody test ... The mononucleosis spot test is done when symptoms of mononucleosis are ... Fatigue Fever Large spleen (possibly) Sore throat Tender ...
Binomial vs poisson statistics in radiation studies
International Nuclear Information System (INIS)
Foster, J.; Kouris, K.; Spyrou, N.M.; Matthews, I.P.; Welsh National School of Medicine, Cardiff
1983-01-01
The processes of radioactive decay, decay and growth of radioactive species in a radioactive chain, prompt emission(s) from nuclear reactions, conventional activation and cyclic activation are discussed with respect to their underlying statistical density function. By considering the transformation(s) that each nucleus may undergo it is shown that all these processes are fundamentally binomial. Formally, when the number of experiments N is large and the probability of success p is close to zero, the binomial is closely approximated by the Poisson density function. In radiation and nuclear physics, N is always large: each experiment can be conceived of as the observation of the fate of each of the N nuclei initially present. Whether p, the probability that a given nucleus undergoes a prescribed transformation, is close to zero depends on the process and nuclide(s) concerned. Hence, although a binomial description is always valid, the Poisson approximation is not always adequate. Therefore further clarification is provided as to when the binomial distribution must be used in the statistical treatment of detected events. (orig.)
Laser interference lithography with highly accurate interferometric alignment
van Soest, Frank J.; van Wolferen, Hendricus A.G.M.; Hoekstra, Hugo; de Ridder, R.M.; Worhoff, Kerstin; Lambeck, Paul
It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution have been demonstrated.
Laser interference lithography with highly accurate interferometric alignment
van Soest, Frank J.; van Wolferen, Hendricus A.G.M.; Hoekstra, Hugo; de Ridder, R.M.; Worhoff, Kerstin; Lambeck, Paul
It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 angular and a few nanometers lateral resolution have been demonstrated.
Fabrication of Partially Transparent Petaled Masks Using Gray Scale Lithography
National Aeronautics and Space Administration — In this study we intend to fabricate partially transparent petal (PTP) masks using gray scale lithography on high-energy beam sensitive (HEBS) glass and evaluate its...
International Nuclear Information System (INIS)
Hoshino, Takayuki; Mabuchi, Kunihiko
2013-01-01
Highlights: ► An electron beam lithography (EBL) was used as an in situ nano processing for a living cell. ► A synchronized optics was containing an inverted EBL and an optical microscope. ► This system visualized real-time images of the EB-induced nano processing. ► We demonstrated the nano processing for a culturing cell with 200–300 nm resolution. ► Our system would be able to provide high resolution display of virtual environments. -- Abstract: The beam profile of an electron beam (EB) can be focused onto less than a nanometer spot and scanned over a wide field with extremely high speed sweeping. Thus, EB is employed for nano scale lithography in applied physics research studies and in fabrication of semiconductors. We applied a scanning EB as a control system for a living cell membrane which is representative of large scale complex systems containing nanometer size components. First, we designed the opposed co-axial dual optics containing inverted electron beam lithography (I-EBL) system and a fluorescent optical microscope. This system could provide in situ nano processing for a culturing living cell on a 100-nm-thick SiN nanomembrane, which was placed between the I-EBL and the fluorescent optical microscope. Then we demonstrated the EB-induced chemical direct nano processing for a culturing cell with hundreds of nanometer resolution and visualized real-time images of the scanning spot of the EB-induced luminescent emission and chemical processing using a high sensitive camera mounted on the optical microscope. We concluded that our closed-loop in situ nano processing would be able to provide a nanometer resolution display of virtual molecule environments to study functional changes of bio-molecule systems
Evolution in the concentration of activities in lithography
Levinson, Harry J.
2016-03-01
From a perusal of the proceedings of the SPIE Advanced Lithography Symposium, the progression of new concepts in lithographic technology can be seen. A new idea first appears in a few papers, and over time, there is an increase in the number of papers on the same topic. Eventually the method becomes commonplace, and the number of papers on the topic declines, as the idea becomes part of our industry's working knowledge. For example, one or two papers on resolution enhancement techniques (RETs) appeared in the proceedings of the Optical Microlithography Conference in 1989 and 1990. By 1994, the total number of papers had increased to 35. Early lithographers focused on practical issues, such as adhesion promotion and resist edge bead. The introduction of simulation software brought on the next era of lithography. This was followed by a period of time in which RETs were developed and brought to maturity. The introduction of optical proximity corrections (OPC) initiated the next major era of lithography. The traditional path for scaling by using shorter wavelengths, decreasing k1 and increasing numerical aperture has given way to the current era of optical multiple patterning and lithography-design co-optimization. There has been sufficient activity in EUV lithography R and D to justify a separate EUV Lithography Conference as part of the annual Advanced Lithography Symposium. Each era builds on the cumulative knowledge gained previously. Over time, there have been parallel developments in optics, exposure tools, resist, metrology and mask technology, many of which were associated with changes in the wavelength of light used for leading-edge lithography.
Displacement Talbot lithography: an alternative technique to fabricate nanostructured metamaterials
Le Boulbar, E. D.; Chausse, P. J. P.; Lis, S.; Shields, P. A.
2017-06-01
Nanostructured materials are essential for many recent electronic, magnetic and optical devices. Lithography is the most common step used to fabricate organized and well calibrated nanostructures. However, feature sizes less than 200 nm usually require access to deep ultraviolet photolithography, e-beam lithography or soft lithography (nanoimprinting), which are either expensive, have low-throughput or are sensitive to defects. Low-cost, high-throughput and low-defect-density techniques are therefore of interest for the fabrication of nanostructures. In this study, we investigate the potential of displacement Talbot lithography for the fabrication of specific structures of interest within plasmonic and metamaterial research fields. We demonstrate that nanodash arrays and `fishnet'-like structures can be fabricated by using a double exposure of two different linear grating phase masks. Feature sizes can be tuned by varying the exposure doses. Such lithography has been used to fabricate metallic `fishnet'-like structures using a lift-off technique. This proof of principle paves the way to a low-cost, high-throughput, defect-free and large-scale technique for the fabrication of structures that could be useful for metamaterial and plasmonic metasurfaces. With the development of deep ultraviolet displacement Talbot lithography, the feature dimensions could be pushed lower and used for the fabrication of optical metamaterials in the visible range.
Focused ion beam lithography for rapid prototyping of metallic films
Energy Technology Data Exchange (ETDEWEB)
Osswald, Patrick; Kiermaier, Josef; Becherer, Markus; Schmitt-Landsiedel, Doris [Lehrstuhl fuer Technische Elektronik, TU Muenchen, Munich (Germany)
2010-07-01
We present FIB-lithography methods for rapid and cost-effective prototyping of metal structures covering the deep-submicron- to the millimeter-range in a single lithography cycle. Focused ion beam (FIB) systems are widely used in semiconductor industry and research facilities for both analytical testing and prototyping. A typical application is to apply electrical contact to micron-sized sensors/particles by FIB induced metal deposition. However, as for E-beam lithography, patterning times for large area bonding pads are unacceptably long, resulting in cost-intensive prototyping. In this work, we optimized FIB lithography processing for negative and positive imaging mode to form metallic structures for large-areas down do the sub-100 nm range. For negative lithography features are defined by implanting Ga{sup +}-ions into a commercial photo resist, without affecting the underlying structures by impinging ions. The structures are highly suitable for following lift-off processing due to the undercut of the resist.Metallic feature size of down to 150 nm are achievable. For positive lithography a PMMA resist is exposed in FIB irradiation. Due to the very low dose (3.10{sup 12} ions/cm{sup 2}) the writing time for an e.g. 100 {mu}m x 100 {mu}m square is approx. 15 seconds. The developed resist is used for subsequent wet chemical etching, obtaining a 100 nm resolution in metal layers.
On a Poisson homogeneous space of bilinear forms with a Poisson-Lie action
Chekhov, L. O.; Mazzocco, M.
2017-12-01
Let \\mathscr A be the space of bilinear forms on C^N with defining matrices A endowed with a quadratic Poisson structure of reflection equation type. The paper begins with a short description of previous studies of the structure, and then this structure is extended to systems of bilinear forms whose dynamics is governed by the natural action A\\mapsto B ABT} of the {GL}_N Poisson-Lie group on \\mathscr A. A classification is given of all possible quadratic brackets on (B, A)\\in {GL}_N× \\mathscr A preserving the Poisson property of the action, thus endowing \\mathscr A with the structure of a Poisson homogeneous space. Besides the product Poisson structure on {GL}_N× \\mathscr A, there are two other (mutually dual) structures, which (unlike the product Poisson structure) admit reductions by the Dirac procedure to a space of bilinear forms with block upper triangular defining matrices. Further generalisations of this construction are considered, to triples (B,C, A)\\in {GL}_N× {GL}_N× \\mathscr A with the Poisson action A\\mapsto B ACT}, and it is shown that \\mathscr A then acquires the structure of a Poisson symmetric space. Generalisations to chains of transformations and to the quantum and quantum affine algebras are investigated, as well as the relations between constructions of Poisson symmetric spaces and the Poisson groupoid. Bibliography: 30 titles.
PENERAPAN REGRESI BINOMIAL NEGATIF UNTUK MENGATASI OVERDISPERSI PADA REGRESI POISSON
Directory of Open Access Journals (Sweden)
PUTU SUSAN PRADAWATI
2013-09-01
Full Text Available Poisson regression was used to analyze the count data which Poisson distributed. Poisson regression analysis requires state equidispersion, in which the mean value of the response variable is equal to the value of the variance. However, there are deviations in which the value of the response variable variance is greater than the mean. This is called overdispersion. If overdispersion happens and Poisson Regression analysis is being used, then underestimated standard errors will be obtained. Negative Binomial Regression can handle overdispersion because it contains a dispersion parameter. From the simulation data which experienced overdispersion in the Poisson Regression model it was found that the Negative Binomial Regression was better than the Poisson Regression model.
Thinning spatial point processes into Poisson processes
DEFF Research Database (Denmark)
Møller, Jesper; Schoenberg, Frederic Paik
This paper describes methods for randomly thinning certain classes of spatial point processes. In the case of a Markov point process, the proposed method involves a dependent thinning of a spatial birth-and-death process, where clans of ancestors associated with the original points are identified......, and where one simulates backwards and forwards in order to obtain the thinned process. In the case of a Cox process, a simple independent thinning technique is proposed. In both cases, the thinning results in a Poisson process if and only if the true Papangelou conditional intensity is used, and thus can...... be used as a diagnostic for assessing the goodness-of-fit of a spatial point process model. Several examples, including clustered and inhibitive point processes, are considered....
Thinning spatial point processes into Poisson processes
DEFF Research Database (Denmark)
Møller, Jesper; Schoenberg, Frederic Paik
2010-01-01
In this paper we describe methods for randomly thinning certain classes of spatial point processes. In the case of a Markov point process, the proposed method involves a dependent thinning of a spatial birth-and-death process, where clans of ancestors associated with the original points...... are identified, and where we simulate backwards and forwards in order to obtain the thinned process. In the case of a Cox process, a simple independent thinning technique is proposed. In both cases, the thinning results in a Poisson process if and only if the true Papangelou conditional intensity is used, and......, thus, can be used as a graphical exploratory tool for inspecting the goodness-of-fit of a spatial point process model. Several examples, including clustered and inhibitive point processes, are considered....
Periodic Poisson Solver for Particle Tracking
International Nuclear Information System (INIS)
Dohlus, M.; Henning, C.
2015-05-01
A method is described to solve the Poisson problem for a three dimensional source distribution that is periodic into one direction. Perpendicular to the direction of periodicity a free space (or open) boundary is realized. In beam physics, this approach allows to calculate the space charge field of a continualized charged particle distribution with periodic pattern. The method is based on a particle mesh approach with equidistant grid and fast convolution with a Green's function. The periodic approach uses only one period of the source distribution, but a periodic extension of the Green's function. The approach is numerically efficient and allows the investigation of periodic- and pseudo-periodic structures with period lengths that are small compared to the source dimensions, for instance of laser modulated beams or of the evolution of micro bunch structures. Applications for laser modulated beams are given.
Compound Poisson Approximations for Sums of Random Variables
Serfozo, Richard F.
1986-01-01
We show that a sum of dependent random variables is approximately compound Poisson when the variables are rarely nonzero and, given they are nonzero, their conditional distributions are nearly identical. We give several upper bounds on the total-variation distance between the distribution of such a sum and a compound Poisson distribution. Included is an example for Markovian occurrences of a rare event. Our bounds are consistent with those that are known for Poisson approximations for sums of...
Brown, G C; Brown, M M; Hiller, T; Fischer, D; Benson, W E; Magargal, L E
1985-01-01
A series of 24 consecutive patients presenting with a fundus picture characterized by a predominance of cotton-wool spots, or a single cotton-wool spot, is reported. Excluded were patients with known diabetes mellitus. Etiologic conditions found included previously undiagnosed diabetes mellitus in five patients, systemic hypertension in five patients, cardiac valvular disease in two patients, radiation retinopathy in two patients, and severe carotid artery obstruction in two patients. Dermatomyositis, systemic lupus erythematosus, polyarteritis nodosa, leukemia, AIDS, Purtscher's retinopathy, metastatic carcinoma, intravenous drug abuse, partial central retinal artery obstruction, and giant cell arteritis were each found in one patient. In only one patient did a systemic workup fail to reveal an underlying cause. The presence of even one cotton-wool spot in an otherwise normal fundus necessitates an investigation to ascertain systemic etiologic factors.
Poisson-Boltzmann versus Size-Modified Poisson-Boltzmann Electrostatics Applied to Lipid Bilayers.
Wang, Nuo; Zhou, Shenggao; Kekenes-Huskey, Peter M; Li, Bo; McCammon, J Andrew
2014-12-26
Mean-field methods, such as the Poisson-Boltzmann equation (PBE), are often used to calculate the electrostatic properties of molecular systems. In the past two decades, an enhancement of the PBE, the size-modified Poisson-Boltzmann equation (SMPBE), has been reported. Here, the PBE and the SMPBE are reevaluated for realistic molecular systems, namely, lipid bilayers, under eight different sets of input parameters. The SMPBE appears to reproduce the molecular dynamics simulation results better than the PBE only under specific parameter sets, but in general, it performs no better than the Stern layer correction of the PBE. These results emphasize the need for careful discussions of the accuracy of mean-field calculations on realistic systems with respect to the choice of parameters and call for reconsideration of the cost-efficiency and the significance of the current SMPBE formulation.
Perturbation-induced emergence of Poisson-like behavior in non-Poisson systems
International Nuclear Information System (INIS)
Akin, Osman C; Grigolini, Paolo; Paradisi, Paolo
2009-01-01
The response of a system with ON–OFF intermittency to an external harmonic perturbation is discussed. ON–OFF intermittency is described by means of a sequence of random events, i.e., the transitions from the ON to the OFF state and vice versa. The unperturbed waiting times (WTs) between two events are assumed to satisfy a renewal condition, i.e., the WTs are statistically independent random variables. The response of a renewal model with non-Poisson ON–OFF intermittency, associated with non-exponential WT distribution, is analyzed by looking at the changes induced in the WT statistical distribution by the harmonic perturbation. The scaling properties are also studied by means of diffusion entropy analysis. It is found that, in the range of fast and relatively strong perturbation, the non-Poisson system displays a Poisson-like behavior in both WT distribution and scaling. In particular, the histogram of perturbed WTs becomes a sequence of equally spaced peaks, with intensity decaying exponentially in time. Further, the diffusion entropy detects an ordinary scaling (related to normal diffusion) instead of the expected unperturbed anomalous scaling related to the inverse power-law decay. Thus, an analysis based on the WT histogram and/or on scaling methods has to be considered with some care when dealing with perturbed intermittent systems
STRUCTURING OF DIAMOND FILMS USING MICROSPHERE LITHOGRAPHY
Directory of Open Access Journals (Sweden)
Mária Domonkos
2014-10-01
Full Text Available In this study, the structuring of micro- and nanocrystalline diamond thin ﬁlms is demonstrated. The structuring of the diamond ﬁlms is performed using the technique of microsphere lithography followed by reactive ion etching. Specifically, this paper presents a four-step fabrication process: diamond deposition (microwave plasma assisted chemical vapor deposition, mask preparation (by the standard Langmuir-Blodgett method, mask modification and diamond etching. A self-assembled monolayer of monodisperse polystyrene (PS microspheres with close-packed ordering is used as the primary template. Then the PS microspheres and the diamond films are processed in capacitively coupled radiofrequency plasma using different plasma chemistries. This fabrication method illustrates the preparation of large arrays of periodic and homogeneous hillock-like structures. The surface morphology of processed diamond films is characterized by scanning electron microscopy and atomic force microscope. The potential applications of such diamond structures in various fields of nanotechnology are also briefly discussed.
Evaporative Lithography in Open Microfluidic Channel Networks
Lone, Saifullah
2017-02-24
We demonstrate a direct capillary-driven method based on wetting and evaporation of various suspensions to fabricate regular two-dimensional wires in an open microfluidic channel through continuous deposition of micro- or nanoparticles under evaporative lithography, akin to the coffee-ring effect. The suspension is gently placed in a loading reservoir connected to the main open microchannel groove on a PDMS substrate. Hydrophilic conditions ensure rapid spreading of the suspension from the loading reservoir to fill the entire channel length. Evaporation during the spreading and after the channel is full increases the particle concentration toward the end of the channel. This evaporation-induced convective transport brings particles from the loading reservoir toward the channel end where this flow deposits a continuous multilayered particle structure. The particle deposition front propagates backward over the entire channel length. The final dry deposit of the particles is thereby much thicker than the initial volume fraction of the suspension. The deposition depth is characterized using a 3D imaging profiler, whereas the deposition topography is revealed using a scanning electron microscope. The patterning technology described here is robust and passive and hence operates without an external field. This work may well become a launching pad to construct low-cost and large-scale thin optoelectronic films with variable thicknesses and interspacing distances.
Reflective masks for extreme ultraviolet lithography
Energy Technology Data Exchange (ETDEWEB)
Nguyen, Khanh Bao [Univ. of California, Berkeley, CA (United States)
1994-05-01
Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 μm wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.
Hard pellicle study for 157-nm lithography
Shu, Emily Y.; Lo, Fu-Chang; Eschbach, Florence O.; Cotte, Eric P.; Engelstad, Roxann L.; Lovell, Edward G.; Okada, Kaname; Kikugawa, Shinya
2002-07-01
Identifying a functional pellicle solution for 157-nm lithography remains the most critical issue for mask technology. Developing a hard pellicle system has been a recent focus of study. Fabrication and potential pellicle-induced image placement errors present the highest challenges to the technology for meeting the stringent error budget for manufacturing devices in the 65-nm regime. This paper reports the results of a comprehensive proof-of-concept study on the state-of-art hard pellicle systems, which feature 800-mm thick modified fused silica pellicles and quartz frames. Pellicles were fabricated to ensure optical uniformity and flatness. Typical intrinsic warpage of these pellicles was close to the theoretical limit of 4.0 mm under a gravitational load. Quartz frames had bows less than 1.0 mm. The advantage of quartz frames with matched thermal expansion was demonstrated. An interferometric facility was developed to measure the flatness of the mask and pellicle system before and after pellicle mounting. Depending on the mounting process as well as mounting tool characteristics and techniques, variations were observed from pellicle to pellicle, mount to mount, and mask to mask. A redesign of the mounter and mounting process has significantly improved pellicle flatness. Finite element models were also generated to characterize the relative importance of the principal sources of pellicle-induced photomask distortions. Simulation results provide insightful guidance for improving image quality when employing a hard pellicle.
Energy Technology Data Exchange (ETDEWEB)
Dai, Zhigao; Liao, Lei; Wu, Wei; Guo, Shishang; Zhao, Xinyue; Li, Wei; Ren, Feng; Jiang, Changzhong, E-mail: xxh@whu.edu.cn, E-mail: czjiang@whu.edu.cn [Department of Physics, Hubei Nuclear Solid Physics Key Laboratory and Center for Ion Beam Application, Wuhan University, Wuhan 430072 (China); Mei, Fei [Department of Physics, Hubei Nuclear Solid Physics Key Laboratory and Center for Ion Beam Application, Wuhan University, Wuhan 430072 (China); School of Electrical and Electronic Engineering, Hubei University of Technology, Wuhan 430068 (China); Xiao, Xiangheng, E-mail: xxh@whu.edu.cn, E-mail: czjiang@whu.edu.cn [Department of Physics, Hubei Nuclear Solid Physics Key Laboratory and Center for Ion Beam Application, Wuhan University, Wuhan 430072 (China); Department of Chemistry and Biochemistry, University of California, Los Angeles, California 90095 (United States); Fu, Lei; Wang, Jiao [College of Chemistry and Molecular Science, Wuhan University, Wuhan 430072 (China)
2014-07-21
The Ag nanoparticles (NPs) surrounding triangular nanoarrays (TNAs) with high number density of surface-enhanced Raman scattering (SERS) hot spots (SERS hot spots ring) are prepared by a combination of NPs deposition and subsequent colloid lithography processing. Owing to the SERS hot spots ring, the Ag NPs surrounding TNAs have been proved an excellent candidate for ultrasensitive molecular sensing for their high SERS signal enhancing capacity in experiments and theories. The Ag NPs surrounding TNAs can be readily used for the quick detection of low concentrations of molecules related to food safety; herein, detection of melamine is discussed.
Directory of Open Access Journals (Sweden)
Manuel R. Gonçalves
2011-08-01
Full Text Available We present two routes for the fabrication of plasmonic structures based on nanosphere lithography templates. One route makes use of soft-lithography to obtain arrays of epoxy resin hemispheres, which, in a second step, can be coated by metal films. The second uses the hexagonal array of triangular structures, obtained by evaporation of a metal film on top of colloidal crystals, as a mask for reactive ion etching (RIE of the substrate. In this way, the triangular patterns of the mask are transferred to the substrate through etched triangular pillars. Making an epoxy resin cast of the pillars, coated with metal films, allows us to invert the structure and obtain arrays of triangular holes within the metal. Both fabrication methods illustrate the preparation of large arrays of nanocavities within metal films at low cost.Gold films of different thicknesses were evaporated on top of hemispherical structures of epoxy resin with different radii, and the reflectance and transmittance were measured for optical wavelengths. Experimental results show that the reflectivity of coated hemispheres is lower than that of coated polystyrene spheres of the same size, for certain wavelength bands. The spectral position of these bands correlates with the size of the hemispheres. In contrast, etched structures on quartz coated with gold films exhibit low reflectance and transmittance values for all wavelengths measured. Low transmittance and reflectance indicate high absorbance, which can be utilized in experiments requiring light confinement.
Poisson cohomology of scalar multidimensional Dubrovin-Novikov brackets
Carlet, Guido; Casati, Matteo; Shadrin, Sergey
2017-04-01
We compute the Poisson cohomology of a scalar Poisson bracket of Dubrovin-Novikov type with D independent variables. We find that the second and third cohomology groups are generically non-vanishing in D > 1. Hence, in contrast with the D = 1 case, the deformation theory in the multivariable case is non-trivial.
Avoiding negative populations in explicit Poisson tau-leaping.
Cao, Yang; Gillespie, Daniel T; Petzold, Linda R
2005-08-01
The explicit tau-leaping procedure attempts to speed up the stochastic simulation of a chemically reacting system by approximating the number of firings of each reaction channel during a chosen time increment tau as a Poisson random variable. Since the Poisson random variable can have arbitrarily large sample values, there is always the possibility that this procedure will cause one or more reaction channels to fire so many times during tau that the population of some reactant species will be driven negative. Two recent papers have shown how that unacceptable occurrence can be avoided by replacing the Poisson random variables with binomial random variables, whose values are naturally bounded. This paper describes a modified Poisson tau-leaping procedure that also avoids negative populations, but is easier to implement than the binomial procedure. The new Poisson procedure also introduces a second control parameter, whose value essentially dials the procedure from the original Poisson tau-leaping at one extreme to the exact stochastic simulation algorithm at the other; therefore, the modified Poisson procedure will generally be more accurate than the original Poisson procedure.
Estimation of a Non-homogeneous Poisson Model: An Empirical ...
African Journals Online (AJOL)
This article aims at applying the Nonhomogeneous Poisson process to trends of economic development. For this purpose, a modified Nonhomogeneous Poisson process is derived when the intensity rate is considered as a solution of stochastic differential equation which satisfies the geometric Brownian motion. The mean ...
Formulation of Hamiltonian mechanics with even and odd Poisson brackets
International Nuclear Information System (INIS)
Khudaverdyan, O.M.; Nersesyan, A.P.
1987-01-01
A possibility is studied as to constrict the odd Poisson bracket and odd Hamiltonian by the given dynamics in phase superspace - the even Poisson bracket and even Hamiltonian so the transition to the new structure does not change the equations of motion. 9 refs
Cluster X-varieties, amalgamation, and Poisson-Lie groups
DEFF Research Database (Denmark)
Fock, V. V.; Goncharov, A. B.
2006-01-01
In this paper, starting from a split semisimple real Lie group G with trivial center, we define a family of varieties with additional structures. We describe them as cluster χ-varieties, as defined in [FG2]. In particular they are Poisson varieties. We define canonical Poisson maps of these varie...
Derivation of relativistic wave equation from the Poisson process
Indian Academy of Sciences (India)
Abstract. A Poisson process is one of the fundamental descriptions for relativistic particles: both fermions and bosons. A generalized linear photon wave equation in dispersive and homogeneous medium with dissipation is derived using the formulation of the Poisson process. This formulation provides a possible ...
Submicron hollow spot generation by solid immersion lens and structured illumination
International Nuclear Information System (INIS)
Kim, M-S; Scharf, T; Herzig, H P; Assafrao, A C; Wachters, A J H; Pereira, S F; Urbach, H P; Brun, M; Olivier, S; Nicoletti, S
2012-01-01
We report on the experimental and numerical demonstration of immersed submicron-size hollow focused spots, generated by structuring the polarization state of an incident light beam impinging on a micro-size solid immersion lens (μ-SIL) made of SiO 2 . Such structured focal spots are characterized by a doughnut-shaped intensity distribution, whose central dark region is of great interest for optical trapping of nano-size particles, super-resolution microscopy and lithography. In this work, we have used a high-resolution interference microscopy technique to measure the structured immersed focal spots, whose dimensions were found to be significantly reduced due to the immersion effect of the μ-SIL. In particular, a reduction of 37% of the dark central region was verified. The measurements were compared with a rigorous finite element method model for the μ-SIL, revealing excellent agreement between them. (paper)
Unimodularity criteria for Poisson structures on foliated manifolds
Pedroza, Andrés; Velasco-Barreras, Eduardo; Vorobiev, Yury
2018-03-01
We study the behavior of the modular class of an orientable Poisson manifold and formulate some unimodularity criteria in the semilocal context, around a (singular) symplectic leaf. Our results generalize some known unimodularity criteria for regular Poisson manifolds related to the notion of the Reeb class. In particular, we show that the unimodularity of the transverse Poisson structure of the leaf is a necessary condition for the semilocal unimodular property. Our main tool is an explicit formula for a bigraded decomposition of modular vector fields of a coupling Poisson structure on a foliated manifold. Moreover, we also exploit the notion of the modular class of a Poisson foliation and its relationship with the Reeb class.
Non-polydimethylsiloxane devices for oxygen-free flow lithography
Bong, Ki Wan; Xu, Jingjing; Kim, Jong-Ho; Chapin, Stephen C.; Strano, Michael S.; Gleason, Karen K.; Doyle, Patrick S.
2012-05-01
Flow lithography has become a powerful particle synthesis technique. Currently, flow lithography relies on the use of polydimethylsiloxane microchannels, because the process requires local inhibition of polymerization, near channel interfaces, via oxygen permeation. The dependence on polydimethylsiloxane devices greatly limits the range of precursor materials that can be processed in flow lithography. Here we present oxygen-free flow lithography via inert fluid-lubrication layers for the synthesis of new classes of complex microparticles. We use an initiated chemical vapour deposition nano-adhesive bonding technique to create non-polydimethylsiloxane-based devices. We successfully synthesize microparticles with a sub-second residence time and demonstrate on-the-fly alteration of particle height. This technique greatly expands the synthesis capabilities of flow lithography, enabling particle synthesis, using water-insoluble monomers, organic solvents, and hydrophobic functional entities such as quantum dots and single-walled carbon nanotubes. As one demonstrative application, we created near-infrared barcoded particles for real-time, label-free detection of target analytes.
Non-polydimethylsiloxane devices for oxygen-free flow lithography.
Bong, Ki Wan; Xu, Jingjing; Kim, Jong-Ho; Chapin, Stephen C; Strano, Michael S; Gleason, Karen K; Doyle, Patrick S
2012-05-01
Flow lithography has become a powerful particle synthesis technique. Currently, flow lithography relies on the use of polydimethylsiloxane microchannels, because the process requires local inhibition of polymerization, near channel interfaces, via oxygen permeation. The dependence on polydimethylsiloxane devices greatly limits the range of precursor materials that can be processed in flow lithography. Here we present oxygen-free flow lithography via inert fluid-lubrication layers for the synthesis of new classes of complex microparticles. We use an initiated chemical vapour deposition nano-adhesive bonding technique to create non-polydimethylsiloxane-based devices. We successfully synthesize microparticles with a sub-second residence time and demonstrate on-the-fly alteration of particle height. This technique greatly expands the synthesis capabilities of flow lithography, enabling particle synthesis, using water-insoluble monomers, organic solvents, and hydrophobic functional entities such as quantum dots and single-walled carbon nanotubes. As one demonstrative application, we created near-infrared barcoded particles for real-time, label-free detection of target analytes.
Czech Academy of Sciences Publication Activity Database
Feireisl, Eduard; Laurençot, P.
2007-01-01
Roč. 88, - (2007), s. 325-349 ISSN 0021-7824 R&D Projects: GA ČR GA201/05/0164 Institutional research plan: CEZ:AV0Z10190503 Keywords : Navier-Stokes-Fourier- Poisson system * Smoluchowski- Poisson system * singular limit Subject RIV: BA - General Mathematics Impact factor: 1.118, year: 2007
Graphene nanoribbon superlattices fabricated via He ion lithography
Energy Technology Data Exchange (ETDEWEB)
Archanjo, Braulio S., E-mail: bsarchanjo@inmetro.gov.br [Divisão de Metrologia de Materiais, Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMETRO), Duque de Caxias, RJ 25250-020 (Brazil); Fragneaud, Benjamin [Divisão de Metrologia de Materiais, Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMETRO), Duque de Caxias, RJ 25250-020 (Brazil); Departamento de Física, Universidade Federal de Juiz de Fora, Juiz de Fora, MG 36036-330 (Brazil); Gustavo Cançado, Luiz [Divisão de Metrologia de Materiais, Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMETRO), Duque de Caxias, RJ 25250-020 (Brazil); Departamento de Física, Universidade Federal de Minas Gerais, Belo Horizonte, MG 30123-970 (Brazil); Winston, Donald [Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304 (United States); Miao, Feng [Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304 (United States); National Laboratory of Solid State Microstructures, School of Physics, National Center of Microstructures and Quantum Manipulation, Nanjing University, Nanjing 210093 (China); Alberto Achete, Carlos [Divisão de Metrologia de Materiais, Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMETRO), Duque de Caxias, RJ 25250-020 (Brazil); Departamento de Engenharia Metalúrgica e de Materiais, Universidade Federal do Rio de janeiro, Rio de Janeiro RJ 21941-972 (Brazil); Medeiros-Ribeiro, Gilberto [Departamento de Física, Universidade Federal de Minas Gerais, Belo Horizonte, MG 30123-970 (Brazil); Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304 (United States)
2014-05-12
Single-step nano-lithography was performed on graphene sheets using a helium ion microscope. Parallel “defect” lines of ∼1 μm length and ≈5 nm width were written to form nanoribbon gratings down to 20 nm pitch. Polarized Raman spectroscopy shows that crystallographic orientation of the nanoribbons was partially maintained at their lateral edges, indicating a high-fidelity lithography process. Furthermore, Raman analysis of large exposure areas with different ion doses reveals that He ions produce point defects with radii ∼ 2× smaller than do Ga ions, demonstrating that scanning-He{sup +}-beam lithography can texture graphene with less damage.
Poisson Mixture Regression Models for Heart Disease Prediction
Erol, Hamza
2016-01-01
Early heart disease control can be achieved by high disease prediction and diagnosis efficiency. This paper focuses on the use of model based clustering techniques to predict and diagnose heart disease via Poisson mixture regression models. Analysis and application of Poisson mixture regression models is here addressed under two different classes: standard and concomitant variable mixture regression models. Results show that a two-component concomitant variable Poisson mixture regression model predicts heart disease better than both the standard Poisson mixture regression model and the ordinary general linear Poisson regression model due to its low Bayesian Information Criteria value. Furthermore, a Zero Inflated Poisson Mixture Regression model turned out to be the best model for heart prediction over all models as it both clusters individuals into high or low risk category and predicts rate to heart disease componentwise given clusters available. It is deduced that heart disease prediction can be effectively done by identifying the major risks componentwise using Poisson mixture regression model. PMID:27999611
Cheewangkoon, R.; Groenewald, J.Z.; Hyde, K.D.; To-anun, C.; Crous, P.W.
2012-01-01
Chocolate Spot leaf disease of Eucalyptus is associated with several Heteroconium-like species of hyphomycetes that resemble Heteroconium s.str. in morphology. They differ, however, in their ecology, with the former being plant pathogenic, while Heteroconium s.str. is a genus of sooty moulds. Results of molecular analyses, inferred from DNA sequences of the large subunit (LSU) and internal transcribed spacers (ITS) region of nrDNA, delineated four Heteroconium-like species on Eucalyptus, name...
Investigation of the physics of diamond MEMS : diamond allotrope lithography
International Nuclear Information System (INIS)
Zalizniak, I.; Olivero, P.; Jamieson, D.N.; Prawer, S.; Reichart, P.; Rubanov, S.; Petriconi, S.
2005-01-01
We propose a novel lithography process in which ion induced phase transfomations of diamond form sacrificial layers allowing the fabrication of small structures including micro-electromechanical systems (MEMS). We have applied this novel lithography to the fabrication of diamond microcavities, cantilevers and optical waveguides. In this paper we present preliminary experiments directed at the fabrication of suspended diamond disks that have the potential for operation as optical resonators. Such structures would be very durable and resistant to chemical attack with potential applications as novel sensors for extreme environments or high temperature radiation detectors. (author). 3 refs., 3 figs
Directed self-assembly graphoepitaxy template generation with immersion lithography
Ma, Yuansheng; Lei, Junjiang; Andres Torres, J.; Hong, Le; Word, James; Fenger, Germain; Tritchkov, Alexander; Lippincott, George; Gupta, Rachit; Lafferty, Neal; He, Yuan; Bekaert, Joost; Vanderberghe, Geert
2015-07-01
We present an optimization methodology for the template designs of subresolution contacts using directed self-assembly (DSA) with graphoepitaxy and immersion lithography. We demonstrate the flow using a 60-nm-pitch contact design in doublet with Monte Carlo simulations for DSA. We introduce the notion of template error enhancement factor (TEEF) to gauge the sensitivity of DSA printing infidelity to template printing infidelity and evaluate optimized template designs with TEEF metrics. Our data show that source mask optimization and inverse lithography technology are critical to achieve sub-80 nm non-L0 pitches for DSA patterns using 193i.
Functionalized SU-8 patterned with X-ray Lithography
DEFF Research Database (Denmark)
Balslev, Søren; Romanato, F.
2005-01-01
spontaneous emission light source that couples out light normal to the chip plane. In addition we examine the influence of the x-ray irradiation on the fluorescence of thin films of dye doped SU-8. The dye embedded in the SU-8 is optically excited during, characterization by an external light source tuned......In this work we demonstrate the feasibility of x-ray lithography on SU-8 photoresist doped with the laser dye Rhodamine 6G, while retaining the photoactive properties of the embedded dye. Two kinds of structures are fabricated via soft x-ray lithography and characterized: a laser and in amplified...
Directory of Open Access Journals (Sweden)
Palma Peña-Jiménez
2011-01-01
Full Text Available l spot político tiene durante la campaña un objetivo final inequívoco: la consecución del voto favorable. Se dirige al cuerpo electoral a través de la televisión y de Internet, y presenta, en muchos casos, un planteamiento negativo, albergando mensajes destinados a la crítica frontal contra el adversario, más que a la exposición de propuestas propias. Este artículo se centra en el análisis del spot electoral negativo, en aquellas producciones audiovisuales construidas sin más causa que la reprobación del contrincante. Se trata de vídeos que, lejos de emplearse en difundir las potencialidades de la organización y las virtudes de su candidato –además de su programa electoral–, consumen su tiempo en descalificar al oponente mediante la transmisión de mensajes, muchas veces, ad hominem. Repasamos el planteamiento negativo del spot electoral desde su primera manifestación, que en España data de 1996, año de emisión del conocido como vídeo del dóberman, sin olvidar otros ejemplos que completan el objeto de estudio.
International Nuclear Information System (INIS)
Altun, Ali Ozhan; Jeong, Jun-Ho; Rha, Jong-Joo; Kim, Ki-Don; Lee, Eung-Sug
2007-01-01
Cubic boron nitride (c-BN) is one of the hardest known materials (second after diamond). It has a high level of chemical resistance and high UV transmittance. In this study, a stamp for ultra-violet nanoimprint lithography (UV-NIL) was fabricated using a bi-layered BN film deposited on a quartz substrate. Deposition of the BN was done using RF magnetron sputtering. A hexagonal boron nitride (h-BN) layer was deposited for 30 min before c-BN was deposited for 30 min. The thickness of the film was measured as 160 nm. The phase of the c-BN layer was investigated using Fourier transform infrared (FTIR) spectrometry, and it was found that the c-BN layer has a 40% cubic phase. The deposited film was patterned using focused ion beam (FIB) lithography for use as a UV-NIL stamp. Line patterns were fabricated with the line width and line distance set at 150 and 150 nm, respectively. The patterning process was performed by applying different currents to observe the effect of the current value on the pattern profile. The fabricated patterns were investigated using AFM, and it was found that the pattern fabricated by applying a current value of 50 picoamperes (pA) has a better profile with a 65 nm line depth. The UV transmittance of the 160 nm thick film was measured to be 70-86%. The hardness and modulus of the BN was measured to be 12 and 150 GPa, respectively. The water contact angle of the stamp surface was measured at 75 0 . The stamp was applied to UV-NIL without coating with an anti-adhesion layer. Successful imprinting was proved via scanning electron microscope (SEM) images of the imprinted resin
Energy Technology Data Exchange (ETDEWEB)
Altun, Ali Ozhan [Nano-Mechanical Systems Research Center, Korea Institute of Machinery and Materials, 171 Jang-dong, Yuseung-gu, Daejeon 305-343 (Korea, Republic of); Jeong, Jun-Ho [Nano-Mechanical Systems Research Center, Korea Institute of Machinery and Materials, 171 Jang-dong, Yuseung-gu, Daejeon 305-343 (Korea, Republic of); Rha, Jong-Joo [Surface Technology Research Center, Korea Institute of Machinery and Materials, 66 Sangnam-Dong, Changwon-Shi, Kyungnam-Do (Korea, Republic of); Kim, Ki-Don [Nano-Mechanical Systems Research Center, Korea Institute of Machinery and Materials, 171 Jang-dong, Yuseung-gu, Daejeon 305-343 (Korea, Republic of); Lee, Eung-Sug [Nano-Mechanical Systems Research Center, Korea Institute of Machinery and Materials, 171 Jang-dong, Yuseung-gu, Daejeon 305-343 (Korea, Republic of)
2007-11-21
Cubic boron nitride (c-BN) is one of the hardest known materials (second after diamond). It has a high level of chemical resistance and high UV transmittance. In this study, a stamp for ultra-violet nanoimprint lithography (UV-NIL) was fabricated using a bi-layered BN film deposited on a quartz substrate. Deposition of the BN was done using RF magnetron sputtering. A hexagonal boron nitride (h-BN) layer was deposited for 30 min before c-BN was deposited for 30 min. The thickness of the film was measured as 160 nm. The phase of the c-BN layer was investigated using Fourier transform infrared (FTIR) spectrometry, and it was found that the c-BN layer has a 40% cubic phase. The deposited film was patterned using focused ion beam (FIB) lithography for use as a UV-NIL stamp. Line patterns were fabricated with the line width and line distance set at 150 and 150 nm, respectively. The patterning process was performed by applying different currents to observe the effect of the current value on the pattern profile. The fabricated patterns were investigated using AFM, and it was found that the pattern fabricated by applying a current value of 50 picoamperes (pA) has a better profile with a 65 nm line depth. The UV transmittance of the 160 nm thick film was measured to be 70-86%. The hardness and modulus of the BN was measured to be 12 and 150 GPa, respectively. The water contact angle of the stamp surface was measured at 75{sup 0}. The stamp was applied to UV-NIL without coating with an anti-adhesion layer. Successful imprinting was proved via scanning electron microscope (SEM) images of the imprinted resin.
Ozhan Altun, Ali; Jeong, Jun-Ho; Rha, Jong-Joo; Kim, Ki-Don; Lee, Eung-Sug
2007-11-01
Cubic boron nitride (c-BN) is one of the hardest known materials (second after diamond). It has a high level of chemical resistance and high UV transmittance. In this study, a stamp for ultra-violet nanoimprint lithography (UV-NIL) was fabricated using a bi-layered BN film deposited on a quartz substrate. Deposition of the BN was done using RF magnetron sputtering. A hexagonal boron nitride (h-BN) layer was deposited for 30 min before c-BN was deposited for 30 min. The thickness of the film was measured as 160 nm. The phase of the c-BN layer was investigated using Fourier transform infrared (FTIR) spectrometry, and it was found that the c-BN layer has a 40% cubic phase. The deposited film was patterned using focused ion beam (FIB) lithography for use as a UV-NIL stamp. Line patterns were fabricated with the line width and line distance set at 150 and 150 nm, respectively. The patterning process was performed by applying different currents to observe the effect of the current value on the pattern profile. The fabricated patterns were investigated using AFM, and it was found that the pattern fabricated by applying a current value of 50 picoamperes (pA) has a better profile with a 65 nm line depth. The UV transmittance of the 160 nm thick film was measured to be 70 86%. The hardness and modulus of the BN was measured to be 12 and 150 GPa, respectively. The water contact angle of the stamp surface was measured at 75°. The stamp was applied to UV-NIL without coating with an anti-adhesion layer. Successful imprinting was proved via scanning electron microscope (SEM) images of the imprinted resin.
Boundary Lax pairs from non-ultra-local Poisson algebras
International Nuclear Information System (INIS)
Avan, Jean; Doikou, Anastasia
2009-01-01
We consider non-ultra-local linear Poisson algebras on a continuous line. Suitable combinations of representations of these algebras yield representations of novel generalized linear Poisson algebras or 'boundary' extensions. They are parametrized by a boundary scalar matrix and depend, in addition, on the choice of an antiautomorphism. The new algebras are the classical-linear counterparts of the known quadratic quantum boundary algebras. For any choice of parameters, the non-ultra-local contribution of the original Poisson algebra disappears. We also systematically construct the associated classical Lax pair. The classical boundary principal chiral model is examined as a physical example.
The Poisson alignment reference system implementation at the Advanced Photon Source
International Nuclear Information System (INIS)
Feier, I.
1998-01-01
The Poisson spot was established using a collimated laser beam from a 3-mW diode laser. It was monitored on a quadrant detector and found to be very sensitive to vibration and air disturbances. Therefore, for future work we strongly recommend a sealed vacuum tube in which the Poisson line may be propagated. A digital single-axis feedback system was employed to generate an straight line reference (SLR) on the X axis. Pointing accuracy was better than 8 ± 2 microns at a distance of 5 m. The digital system was found to be quite slow with a maximum bandwidth of 47 ± 9 Hz. Slow drifts were easily corrected but any vibration over 5 Hz was not. We recommend an analog proportional-integral-derivative (PID) controller for high bandwidth and smooth operation of the kinematic mirror. Although the Poisson alignment system (PAS) at the Advanced Photon Source is still in its infancy, it already shows great promise as a possible alignment system for the low-energy undulator test line (LEUTL). Since components such as wigglers and quadruples will initially be aligned with respect to each other using conventional means and mounted on some kind of rigid rail, the goal would be to align six to ten such rails over a distance of about 30 m. The PAS could be used to align these rails by mounting a sphere at the joint between two rails. These spheres would need to be in a vacuum pipe to eliminate the refractive effects of air. Each sphere would not be attached to either rail but instead to a flange connecting the vacuum pipes of each rail. Thus the whole line would be made up of straight, rigid segments that could be aligned by moving the joints. Each sphere would have its own detector, allowing the operators to actively monitor the position of each joint and therefore the overall alignment of the system
Nanoimprint lithography for functional polymer patterning
Cui, Dehu
2011-07-01
Organic semiconductors have generated huge interested in recent years for low-cost and flexible electronics. Current and future device applications for semiconducting polymers include light-emitting diodes, thin-film transistors, photovoltaic cells, photodetectors, lasers, and memories. The performance of conjugated polymer devices depends on two major factors: the chain conformation in polymer film and the device architecture. Highly ordered chain structure usually leads to much improved performance by enhancing interchain interaction to facilitate carrier transport. The goal of this research is to improve the performance of organic devices with the nanoimprint lithography. The work begins with the controlling of polymer chain orientation in patterned nanostructures through nanoimprint mold design and process parameter manipulation, and studying the effect of chain ordering on material properties. Then, step-and-repeat thermal nanoimprint technique for large-scale continuous manufacturing of conjugated polymer nanostructures is developed. After that, Systematic investigation of polymer chain configuration by Raman spectroscopy is carried out to understand how nanoimprint process parameters, such as mold pattern size, temperature, and polymer molecular weight, affects polymer chain configuration. The results indicate that chain orientation in nanoimprinted polymer micro- and nanostructures is highly related to the nanoimprint temperature and the dimensions of the mold structures. The ability to create nanoscale polymer micro- and nanostructures and manipulate their internal chain conformation establishes an original experimental platform that enables studying the properties of functional polymers at the micro- and nanoscale and understanding their fundamental structure-property relationships. In addition to the impact on basic research, the techniques developed in this work are important in applied research and development. Large-area conjugated polymer micro- and
Modified Regression Correlation Coefficient for Poisson Regression Model
Kaengthong, Nattacha; Domthong, Uthumporn
2017-09-01
This study gives attention to indicators in predictive power of the Generalized Linear Model (GLM) which are widely used; however, often having some restrictions. We are interested in regression correlation coefficient for a Poisson regression model. This is a measure of predictive power, and defined by the relationship between the dependent variable (Y) and the expected value of the dependent variable given the independent variables [E(Y|X)] for the Poisson regression model. The dependent variable is distributed as Poisson. The purpose of this research was modifying regression correlation coefficient for Poisson regression model. We also compare the proposed modified regression correlation coefficient with the traditional regression correlation coefficient in the case of two or more independent variables, and having multicollinearity in independent variables. The result shows that the proposed regression correlation coefficient is better than the traditional regression correlation coefficient based on Bias and the Root Mean Square Error (RMSE).
A high order solver for the unbounded Poisson equation
DEFF Research Database (Denmark)
Hejlesen, Mads Mølholm; Rasmussen, Johannes Tophøj; Chatelain, Philippe
2013-01-01
A high order converging Poisson solver is presented, based on the Greenʼs function solution to Poissonʼs equation subject to free-space boundary conditions. The high order convergence is achieved by formulating regularised integration kernels, analogous to a smoothing of the solution field....... The method is extended to directly solve the derivatives of the solution to Poissonʼs equation. In this way differential operators such as the divergence or curl of the solution field can be solved to the same high order convergence without additional computational effort. The method, is applied...... and validated, however not restricted, to the equations of fluid mechanics, and can be used in many applications to solve Poissonʼs equation on a rectangular unbounded domain....
On the poisson's ratio of the nucleus pulposus.
Farrell, M D; Riches, P E
2013-10-01
Existing experimental data on the Poisson's ratio of nucleus pulposus (NP) tissue is limited. This study aims to determine whether the Poisson's ratio of NP tissue is strain-dependent, strain-rate-dependent, or varies with axial location in the disk. Thirty-two cylindrical plugs of bovine tail NP tissue were subjected to ramp-hold unconfined compression to 20% axial strain in 5% increments, at either 30 μm/s or 0.3 μm/s ramp speeds and the radial displacement determined using biaxial video extensometry. Following radial recoil, the true Poisson's ratio of the solid phase of NP tissue increased linearly with increasing strain and demonstrated strain-rate dependency. The latter finding suggests that the solid matrix undergoes stress relaxation during the test. For small strains, we suggest a Poisson's ratio of 0.125 to be used in biphasic models of the intervertebral disk.
Organisation spatiale du peuplement de poissons dans le Bandama ...
African Journals Online (AJOL)
L'évolution des peuplements de poissons sur le Bandama a été étudiée en considérant quatre zones d'échantillonnage : en amont du lac de Kossou, dans les lacs de Kossou et de Taabo, entre les lacs de Kossou et de Taabo, et en aval du lac de Taabo. Au total, 74 espèces de poisson réparties en 49 genres, 28 familles ...
Formality theory from Poisson structures to deformation quantization
Esposito, Chiara
2015-01-01
This book is a survey of the theory of formal deformation quantization of Poisson manifolds, in the formalism developed by Kontsevich. It is intended as an educational introduction for mathematical physicists who are dealing with the subject for the first time. The main topics covered are the theory of Poisson manifolds, star products and their classification, deformations of associative algebras and the formality theorem. Readers will also be familiarized with the relevant physical motivations underlying the purely mathematical construction.
Poisson structure of the equations of ideal multispecies fluid electrodynamics
International Nuclear Information System (INIS)
Spencer, R.G.
1984-01-01
The equations of the two- (or multi-) fluid model of plasma physics are recast in Hamiltonian form, following general methods of symplectic geometry. The dynamical variables are the fields of physical interest, but are noncanonical, so that the Poisson bracket in the theory is not the standard one. However, it is a skew-symmetric bilinear form which, from the method of derivation, automatically satisfies the Jacobi identity; therefore, this noncanonical structure has all the essential properties of a canonical Poisson bracket
On the Fedosov deformation quantization beyond the regular Poisson manifolds
International Nuclear Information System (INIS)
Dolgushev, V.A.; Isaev, A.P.; Lyakhovich, S.L.; Sharapov, A.A.
2002-01-01
A simple iterative procedure is suggested for the deformation quantization of (irregular) Poisson brackets associated to the classical Yang-Baxter equation. The construction is shown to admit a pure algebraic reformulation giving the Universal Deformation Formula (UDF) for any triangular Lie bialgebra. A simple proof of classification theorem for inequivalent UDF's is given. As an example the explicit quantization formula is presented for the quasi-homogeneous Poisson brackets on two-plane
A Note On the Estimation of the Poisson Parameter
Directory of Open Access Journals (Sweden)
S. S. Chitgopekar
1985-01-01
distribution when there are errors in observing the zeros and ones and obtains both the maximum likelihood and moments estimates of the Poisson mean and the error probabilities. It is interesting to note that either method fails to give unique estimates of these parameters unless the error probabilities are functionally related. However, it is equally interesting to observe that the estimate of the Poisson mean does not depend on the functional relationship between the error probabilities.
Solid state laser driver for Extreme Ultraviolet Lithography. Revision 1
Energy Technology Data Exchange (ETDEWEB)
Zapata, L.E.; Honig, J.; Reichert, P.; Hackel, L.A.
1994-05-01
We describe the design and initial performance of a Nd:YAG laser master oscillator/phase conjugated power amplifier as a driver for extreme ultraviolet lithography. The design provides 0.5 to 1 joule per pulse with about 5 ns pulse width and excellent beam quality up through 1.5 kHz repetition frequency.
Report on the fifth workshop on synchrotron x ray lithography
Williams, G. P.; Godel, J. B.; Brown, G. S.; Liebmann, W.
Semiconductors comprise a greater part of the United States economy than the aircraft, steel, and automobile industries combined. In future the semiconductor manufacturing industry will be forced to switch away from present optical manufacturing methods in the early to mid 1990s. X ray lithography has emerged as the leading contender for continuing production below the 0.4 micron level. Brookhaven National Laboratory began a series of workshops on x ray lithography in 1986 to examine key issues and in particular to enable United States industry to take advantage of the technical base established in this field. Since accelerators provide the brightest sources for x ray lithography, most of the research and development to date has taken place at large accelerator-based research centers such as Brookhaven, the University of Wisconsin, and Stanford. The goals of this Fifth Brookhaven Workshop were to review progress and goals since the last workshop and to establish a blueprint for the future. The meeting focused on the exposure tool, that is, a term defined as the source plus beamline and stepper. In order to assess the appropriateness of schedules for the development of this tool, other aspects of the required technology such as masks, resists and inspection and repair were also reviewed. To accomplish this, two working groups were set up, one to review the overall aspects of x ray lithography and set a time frame, the other to focus on sources.
Polystyrene as a zwitter resist in electron beam lithography based ...
Indian Academy of Sciences (India)
The resist action of polystyrene (w, 2,600,000) towards electroless deposition of gold on Si(100) surface following cross-linking by exposing to a 10 kV electron beam, has been investigated employing a scanning electron microscope equipped with electron beam lithography tool. With a low dose of electrons (21 C/cm2), ...
Fast thermal nanoimprint lithography by a stamp with integrated heater
DEFF Research Database (Denmark)
Tormen, Massimo; Malureanu, Radu; Pedersen, Rasmus Haugstrup
2008-01-01
We propose fast nanoimprinting lithography (NIL) process based on the use of stamps with integrated heater. The latter consists of heavily ion implantation n-type doped silicon layer buried below the microstructured surface of the stamp. The stamp is heated by Joule effect, by 50 μs 25 Hz...
Structure formation in atom lithography using geometric collimation
Meijer, T.; Beardmore, J.P.; Fabrie, C.G.C.H.M.; van Lieshout, J.P.; Notermans, R.P.M.J.W.; Sang, R.T.; Vredenbregt, E.J.D.; Van Leeuwen, K.A.H.
2011-01-01
Atom lithography uses standing wave light fields as arrays of lenses to focus neutral atom beams into line patterns on a substrate. Laser cooled atom beams are commonly used, but an atom beam source with a small opening placed at a large distance from a substrate creates atom beams which are locally
Pattern Definition with DUV-Lithography at DTU Danchip
DEFF Research Database (Denmark)
Keil, Matthias; Khomtchenko, Elena; Nyholt, Henrik
2014-01-01
Deep ultra violet (DUV) illumination generated with the help of a KrF laser can be utilized to produce components having sizes of some hundreds of nanometers. This light source with its 248nm wavelength is exploited in the DUV-lithography equipment at DTU Danchip in order to fill the resolution g...
Hard disk drive thin film head manufactured using nanoimprint lithography
Sullivan, Daniel B.; Boonstra, Thomas; Kief, Mark T.; Youtt, Lily; Jayashankar, Sethuraman; Van Dorn, Carolyn; Gentile, Harold; Viswanathan, Sriram; Wang, Dexin; Song, Dion; Hong, Dongsung; Gee, Sung-Hoon
2014-03-01
The lithographic requirements for the thin film head industry are comparable to the semiconductor industry for certain parameters such as resolution and pattern repeatability. In other aspects such as throughput and defectivity, the requirements tend to be more relaxed. These requirements match well with the strengths and weaknesses reported concerning nanoimprint lithography (NIL) and suggest an alternative approach to optical lithography. We have demonstrated the proof of concept of using NIL patterning, in particular Jet and FlashTM Imprint Lithography (J-FILTM) 1 , to build functional thin film head devices with performance comparable to standard wafer processing techniques. An ImprioTM 300 tool from Molecular Imprints, Inc. (MII) was modified to process the AlTiC ceramic wafers commonly used in the thin film head industry. Templates were produced using commercially viable photomask manufacturing processes and the AlTiC wafer process flow was successfully modified to support NIL processing. Future work is identified to further improve lithographic performance including residual layer thickness uniformity, wafer topography, NIL-->NIL overlay, and development of a large imprint field that exceeds what is available in optical lithography.
Fabrication of periodically ordered diamond nanostructures by microsphere lithography
Czech Academy of Sciences Publication Activity Database
Domonkos, Mária; Ižák, Tibor; Štolcová, L.; Proška, J.; Kromka, Alexander
2014-01-01
Roč. 251, č. 12 (2014), s. 2587-2592 ISSN 0370-1972 R&D Projects: GA ČR(CZ) GBP108/12/G108 Institutional support: RVO:68378271 Keywords : CVD growth * diamond * microsphere lithography * selective area deposition Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.489, year: 2014
Deep x-ray lithography based processing for micromechanics
Energy Technology Data Exchange (ETDEWEB)
Christenson, T.R.
1995-10-01
Deep x-ray lithography based fabrication provides a means to fabricate microactuators with useful output forces. High energy x-ray exposure provides a tool for fabrication of the next generation of precision engineered components. Device characterization, materials science, an metrology continue to pose challenges at this scale.
Wafer scale coating of polymer cantilever fabricated by nanoimprint lithography
DEFF Research Database (Denmark)
Greve, Anders; Dohn, Søren; Keller, Stephan Urs
2010-01-01
Microcantilevers can be fabricated in TOPAS by nanoimprint lithography, with the dimensions of 500 Â¿m length 4.5 Â¿m thickness and 100 Â¿m width. By using a plasma polymerization technique it is possible to selectively functionalize individually cantilevers with a polymer coating, on wafer scale...
Batch fabrication of nanopatterned graphene devices via nanoimprint lithography
DEFF Research Database (Denmark)
Mackenzie, David; Smistrup, Kristian; Whelan, Patrick Rebsdorf
2017-01-01
Previous attempts to tune the electrical properties of large-scale graphene via nanopatterning have led to serious degradation of the key electrical parameters that make graphene a desirable material for electronic devices. We use thermal nanoimprint lithography to pattern wafer-scale graphene...
Receding contact lines: from sliding drops to immersion lithography
Winkels, K.G.; Peters, I.R.; Evangelista, F.; Riepen, M.; Daerr, A.; Limat, L.; Snoeijer, Jacobus Hendrikus
2011-01-01
Instabilities of receding contact lines often occur through the formation of a corner with a very sharp tip. These dewetting structures also appear in the technology of Immersion Lithography, where water is put between the lens and the silicon wafer to increase the optical resolution. In this paper
Background stratified Poisson regression analysis of cohort data.
Richardson, David B; Langholz, Bryan
2012-03-01
Background stratified Poisson regression is an approach that has been used in the analysis of data derived from a variety of epidemiologically important studies of radiation-exposed populations, including uranium miners, nuclear industry workers, and atomic bomb survivors. We describe a novel approach to fit Poisson regression models that adjust for a set of covariates through background stratification while directly estimating the radiation-disease association of primary interest. The approach makes use of an expression for the Poisson likelihood that treats the coefficients for stratum-specific indicator variables as 'nuisance' variables and avoids the need to explicitly estimate the coefficients for these stratum-specific parameters. Log-linear models, as well as other general relative rate models, are accommodated. This approach is illustrated using data from the Life Span Study of Japanese atomic bomb survivors and data from a study of underground uranium miners. The point estimate and confidence interval obtained from this 'conditional' regression approach are identical to the values obtained using unconditional Poisson regression with model terms for each background stratum. Moreover, it is shown that the proposed approach allows estimation of background stratified Poisson regression models of non-standard form, such as models that parameterize latency effects, as well as regression models in which the number of strata is large, thereby overcoming the limitations of previously available statistical software for fitting background stratified Poisson regression models.
Background stratified Poisson regression analysis of cohort data
International Nuclear Information System (INIS)
Richardson, David B.; Langholz, Bryan
2012-01-01
Background stratified Poisson regression is an approach that has been used in the analysis of data derived from a variety of epidemiologically important studies of radiation-exposed populations, including uranium miners, nuclear industry workers, and atomic bomb survivors. We describe a novel approach to fit Poisson regression models that adjust for a set of covariates through background stratification while directly estimating the radiation-disease association of primary interest. The approach makes use of an expression for the Poisson likelihood that treats the coefficients for stratum-specific indicator variables as 'nuisance' variables and avoids the need to explicitly estimate the coefficients for these stratum-specific parameters. Log-linear models, as well as other general relative rate models, are accommodated. This approach is illustrated using data from the Life Span Study of Japanese atomic bomb survivors and data from a study of underground uranium miners. The point estimate and confidence interval obtained from this 'conditional' regression approach are identical to the values obtained using unconditional Poisson regression with model terms for each background stratum. Moreover, it is shown that the proposed approach allows estimation of background stratified Poisson regression models of non-standard form, such as models that parameterize latency effects, as well as regression models in which the number of strata is large, thereby overcoming the limitations of previously available statistical software for fitting background stratified Poisson regression models. (orig.)
Background stratified Poisson regression analysis of cohort data
Energy Technology Data Exchange (ETDEWEB)
Richardson, David B. [University of North Carolina at Chapel Hill, Department of Epidemiology, School of Public Health, Chapel Hill, NC (United States); Langholz, Bryan [Keck School of Medicine, University of Southern California, Division of Biostatistics, Department of Preventive Medicine, Los Angeles, CA (United States)
2012-03-15
Background stratified Poisson regression is an approach that has been used in the analysis of data derived from a variety of epidemiologically important studies of radiation-exposed populations, including uranium miners, nuclear industry workers, and atomic bomb survivors. We describe a novel approach to fit Poisson regression models that adjust for a set of covariates through background stratification while directly estimating the radiation-disease association of primary interest. The approach makes use of an expression for the Poisson likelihood that treats the coefficients for stratum-specific indicator variables as 'nuisance' variables and avoids the need to explicitly estimate the coefficients for these stratum-specific parameters. Log-linear models, as well as other general relative rate models, are accommodated. This approach is illustrated using data from the Life Span Study of Japanese atomic bomb survivors and data from a study of underground uranium miners. The point estimate and confidence interval obtained from this 'conditional' regression approach are identical to the values obtained using unconditional Poisson regression with model terms for each background stratum. Moreover, it is shown that the proposed approach allows estimation of background stratified Poisson regression models of non-standard form, such as models that parameterize latency effects, as well as regression models in which the number of strata is large, thereby overcoming the limitations of previously available statistical software for fitting background stratified Poisson regression models. (orig.)
The Spotting Distribution of Wildfires
Directory of Open Access Journals (Sweden)
Jonathan Martin
2016-06-01
Full Text Available In wildfire science, spotting refers to non-local creation of new fires, due to downwind ignition of brands launched from a primary fire. Spotting is often mentioned as being one of the most difficult problems for wildfire management, because of its unpredictable nature. Since spotting is a stochastic process, it makes sense to talk about a probability distribution for spotting, which we call the spotting distribution. Given a location ahead of the fire front, we would like to know how likely is it to observe a spot fire at that location in the next few minutes. The aim of this paper is to introduce a detailed procedure to find the spotting distribution. Most prior modelling has focused on the maximum spotting distance, or on physical subprocesses. We will use mathematical modelling, which is based on detailed physical processes, to derive a spotting distribution. We discuss the use and measurement of this spotting distribution in fire spread, fire management and fire breaching. The appendix of this paper contains a comprehensive review of the relevant underlying physical sub-processes of fire plumes, launching fire brands, wind transport, falling and terminal velocity, combustion during transport, and ignition upon landing.
Defect reduction progress in step and flash imprint lithography
Selenidis, K.; Maltabes, J.; McMackin, I.; Perez, J.; Martin, W.; Resnick, D. J.; Sreenivasan, S. V.
2007-10-01
Imprint lithography has been shown to be an effective method for the replication of nanometer-scale structures from a template mold. Step and Flash Imprint Lithography (S-FIL ®) is unique in its ability to address both resolution and alignment. Recently overlay across a 200 mm wafer of less than 20nm, 3σ has been demonstrated. Current S-FIL resolution and alignment performance motivates the consideration of nano-imprint lithography as Next Generation Lithography (NGL) solution for IC production. During the S-FIL process, a transferable image, an imprint, is produced by mechanically molding a liquid UV-curable resist on a wafer. The novelty of this process immediately raises questions about the overall defectivity level of S-FIL. Acceptance of imprint lithography for CMOS manufacturing will require demonstration that it can attain defect levels commensurate with the requirements of cost-effective device production. This report specifically focuses on this challenge and presents the current status of defect reduction in S-FIL technology and will summarize the result of defect inspections of wafers patterned using S-FIL. Wafer inspections were performed with a KLA Tencor- 2132 (KT-2132) automated patterned wafer inspection tool. Recent results show wafer defectivity to be less 5 cm -2. Mask fabrication and inspection techniques used to obtain low defect template will be described. The templates used to imprint wafers for this study were designed specifically to facilitate automated defect inspection and were made by employing CMOS industry standard materials and exposure tools. A KT-576 tool was used for template defect inspection.
Protein assay structured on paper by using lithography
Wilhelm, E.; Nargang, T. M.; Al Bitar, W.; Waterkotte, B.; Rapp, B. E.
2015-03-01
There are two main challenges in producing a robust, paper-based analytical device. The first one is to create a hydrophobic barrier which unlike the commonly used wax barriers does not break if the paper is bent. The second one is the creation of the (bio-)specific sensing layer. For this proteins have to be immobilized without diminishing their activity. We solve both problems using light-based fabrication methods that enable fast, efficient manufacturing of paper-based analytical devices. The first technique relies on silanization by which we create a flexible hydrophobic barrier made of dimethoxydimethylsilane. The second technique demonstrated within this paper uses photobleaching to immobilize proteins by means of maskless projection lithography. Both techniques have been tested on a classical lithography setup using printed toner masks and on a lithography system for maskless lithography. Using these setups we could demonstrate that the proposed manufacturing techniques can be carried out at low costs. The resolution of the paper-based analytical devices obtained with static masks was lower due to the lower mask resolution. Better results were obtained using advanced lithography equipment. By doing so we demonstrated, that our technique enables fabrication of effective hydrophobic boundary layers with a thickness of only 342 μm. Furthermore we showed that flourescine-5-biotin can be immobilized on the non-structured paper and be employed for the detection of streptavidinalkaline phosphatase. By carrying out this assay on a paper-based analytical device which had been structured using the silanization technique we proofed biological compatibility of the suggested patterning technique.
Turbulent Spot Pressure Fluctuation Wave Packet Model
Energy Technology Data Exchange (ETDEWEB)
Dechant, Lawrence J. [Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
2017-05-01
Wave packet analysis provides a connection between linear small disturbance theory and subsequent nonlinear turbulent spot flow behavior. The traditional association between linear stability analysis and nonlinear wave form is developed via the method of stationary phase whereby asymptotic (simplified) mean flow solutions are used to estimate dispersion behavior and stationary phase approximation are used to invert the associated Fourier transform. The resulting process typically requires nonlinear algebraic equations inversions that can be best performed numerically, which partially mitigates the value of the approximation as compared to a more complete, e.g. DNS or linear/nonlinear adjoint methods. To obtain a simpler, closed-form analytical result, the complete packet solution is modeled via approximate amplitude (linear convected kinematic wave initial value problem) and local sinusoidal (wave equation) expressions. Significantly, the initial value for the kinematic wave transport expression follows from a separable variable coefficient approximation to the linearized pressure fluctuation Poisson expression. The resulting amplitude solution, while approximate in nature, nonetheless, appears to mimic many of the global features, e.g. transitional flow intermittency and pressure fluctuation magnitude behavior. A low wave number wave packet models also recover meaningful auto-correlation and low frequency spectral behaviors.
Energy Technology Data Exchange (ETDEWEB)
Sudheer,, E-mail: sudheer@rrcat.gov.in, E-mail: sudheer.rrcat@gmail.com; Tiwari, P.; Srivastava, Himanshu; Rai, V. N.; Srivastava, A. K.; Naik, P. A. [Homi Bhabha National Institute, Mumbai, Maharashtra 400094 (India); Indus Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology, Indore, Madhya Pradesh 452013 (India); Porwal, S. [Solid State Lasers Division, Raja Ramanna Centre for Advanced Technology, Indore, Madhya Pradesh 452013 (India); Bhartiya, S. [Homi Bhabha National Institute, Mumbai, Maharashtra 400094 (India); Laser Materials Development and Device Division, Raja Ramanna Centre for Advanced Technology, Indore, Madhya Pradesh 452013 (India); Rao, B. T. [Homi Bhabha National Institute, Mumbai, Maharashtra 400094 (India); Laser Materials Processing Division, Raja Ramanna Centre for Advanced Technology, Indore, Madhya Pradesh 452013 (India); Sharma, T. K. [Homi Bhabha National Institute, Mumbai, Maharashtra 400094 (India); Solid State Lasers Division, Raja Ramanna Centre for Advanced Technology, Indore, Madhya Pradesh 452013 (India)
2016-07-28
The silver nanoparticle surface relief gratings of ∼10 μm period are fabricated using electron beam lithography on the silver halide film substrate. Morphological characterization of the gratings shows that the period, the shape, and the relief depth in the gratings are mainly dependent on the number of lines per frame, the spot size, and the accelerating voltage of electron beam raster in the SEM. Optical absorption of the silver nanoparticle gratings provides a broad localized surface plasmon resonance peak in the visible region, whereas the intensity of the peaks depends on the number density of silver nanoparticles in the gratings. The maximum efficiency of ∼7.2% for first order diffraction is observed for the grating fabricated at 15 keV. The efficiency is peaking at 560 nm with ∼380 nm bandwidth. The measured profiles of the diffraction efficiency for the gratings are found in close agreement with the Raman-Nath diffraction theory. This technique provides a simple and efficient method for the fabrication of plasmonic nanoparticle grating structures with high diffraction efficiency having broad wavelength tuning.
Optically addressable single-use microfluidic valves by laser printer lithography.
Garcia-Cordero, Jose L; Kurzbuch, Dirk; Benito-Lopez, Fernando; Diamond, Dermot; Lee, Luke P; Ricco, Antonio J
2010-10-21
We report the design, fabrication, and characterization of practical microfluidic valves fabricated using laser printer lithography. These optofluidic valves are opened by directing optical energy from a solid-state laser, with similar power characteristics to those used in CD/DVD drives, to a spot of printed toner where localized heating melts an orifice in the polymer layer in as little as 500 ms, connecting previously isolated fluidic components or compartments. Valve functionality, response time, and laser input energy dependence of orifice size are reported for cyclo-olefin polymer (COP) and polyethylene terephthalate (PET) films. Implementation of these optofluidic valves is demonstrated on pressure-driven and centrifugal microfluidic platforms. In addition, these "one-shot" valves comprise a continuous polymer film that hermetically isolates on-chip fluid volumes within fluidic devices using low-vapor-permeability materials; we confirmed this for a period of one month. The fabrication and integration of optofluidic valves are compatible with a range of polymer microfabrication technologies and should facilitate the development of fully integrated, reconfigurable, and automated lab-on-a-chip systems, particularly when reagents must be stored on chip for extended periods, e.g. for medical diagnostic devices, lab-on-a-chip synthetic systems, or hazardous biochemical analysis platforms.
Poisson sigma model with branes and hyperelliptic Riemann surfaces
International Nuclear Information System (INIS)
Ferrario, Andrea
2008-01-01
We derive the explicit form of the superpropagators in the presence of general boundary conditions (coisotropic branes) for the Poisson sigma model. This generalizes the results presented by Cattaneo and Felder [''A path integral approach to the Kontsevich quantization formula,'' Commun. Math. Phys. 212, 591 (2000)] and Cattaneo and Felder ['Coisotropic submanifolds in Poisson geometry and branes in the Poisson sigma model', Lett. Math. Phys. 69, 157 (2004)] for Kontsevich's angle function [Kontsevich, M., 'Deformation quantization of Poisson manifolds I', e-print arXiv:hep.th/0101170] used in the deformation quantization program of Poisson manifolds. The relevant superpropagators for n branes are defined as gauge fixed homotopy operators of a complex of differential forms on n sided polygons P n with particular ''alternating'' boundary conditions. In the presence of more than three branes we use first order Riemann theta functions with odd singular characteristics on the Jacobian variety of a hyperelliptic Riemann surface (canonical setting). In genus g the superpropagators present g zero mode contributions
Advances in spot curing technology
International Nuclear Information System (INIS)
Burga, R.
1999-01-01
A brief review of spot curing technology was presented. The process which a spot of energy of a specific wavelength bandwidth and irradiance is used to cause a coating, encapsulant or adhesive to change from a liquid to a solid state
Solid state microcavity dye lasers fabricated by nanoimprint lithography
DEFF Research Database (Denmark)
Nilsson, Daniel; Nielsen, Theodor; Kristensen, Anders
2004-01-01
We present a solid state polymer microcavity dye laser, fabricated by thermal nanoimprint lithography (NIL) in a dye-doped thermoplast. The thermoplast poly-methylmethacrylate (PMMA) is used due to its high transparency in the visible range and its robustness to laser radiation. The laser dye...... is Rhodamine 6G ClO4. This dye is shown to withstand temperatures up to 240 °C without bleaching, which makes it compatible with the thermal nanoimprint lithography process. The 1.55 µm thick dye-doped PMMA devices are fabricated on a SiO2 substrate, yielding planar waveguiding in the dye-doped PMMA with two...... propagating TE–TM modes. The laser cavity has the lateral shape of a trapezoid, supporting lasing modes by reflection on the vertical cavity walls. The solid polymer dye lasers emit laterally through one of the vertical cavity walls, when pumped optically through the top surface by means of a frequency...
V-groove plasmonic waveguides fabricated by nanoimprint lithography
DEFF Research Database (Denmark)
Fernandez-Cuesta, I.; Nielsen, R.B.; Boltasseva, Alexandra
2007-01-01
Propagation of channel plasmon-polariton modes in the bottom of a metal V groove has been recently demonstrated. It provides a unique way of manipulating light at nanometer length scale. In this work, we present a method based on nanoimprint lithography that allows parallel fabrication of integra...... of integrated optical devices composed of metal V grooves. This method represents an improvement with respect to previous works, where the V grooves were fabricated by direct milling of the metal, in terms of robustness and throughput. © 2007 American Vacuum Society......Propagation of channel plasmon-polariton modes in the bottom of a metal V groove has been recently demonstrated. It provides a unique way of manipulating light at nanometer length scale. In this work, we present a method based on nanoimprint lithography that allows parallel fabrication...
Maskless, parallel patterning with zone-plate array lithography
International Nuclear Information System (INIS)
Carter, D. J. D.; Gil, Dario; Menon, Rajesh; Mondol, Mark K.; Smith, Henry I.; Anderson, Erik H.
1999-01-01
Zone-plate array lithography (ZPAL) is a maskless lithography scheme that uses an array of shuttered zone plates to print arbitrary patterns on a substrate. An experimental ultraviolet ZPAL system has been constructed and used to simultaneously expose nine different patterns with a 3x3 array of zone plates in a quasidot-matrix fashion. We present exposed patterns, describe the system design and construction, and discuss issues essential to a functional ZPAL system. We also discuss another ZPAL system which operates with 4.5 nm x radiation from a point source. We present simulations which show that, with our existing x-ray zone plates and this system, we should be able to achieve 55 nm resolution. (c) 1999 American Vacuum Society
A new lithography of functional plasma polymerized thin films
International Nuclear Information System (INIS)
Kim, Sung-O
2001-01-01
The preparation of the resist for the vacuum lithography was carried out by plasma polymerization. The resist manufactured by plasma polymerization is a monomer produced by MMA (Methyl methacrylate). The functional groups of MMA appeared in the PPMMA (Plasma Polymerized Methyl methacrylate) as well, and this was confirmed through an analysis using FT-IR. The polymerization rate increased as a function of the plasma power and decreased as a function of the system pressure. The sensitivity and contrast of the plasma polymerized thin films were 15 μC/cm2 and 4.3 respectively. The size of the pattern manufactured by Vacuum Lithography using the plasma polymerized thin films was 100 nm
XUV free-electron laser-based projection lithography systems
Energy Technology Data Exchange (ETDEWEB)
Newnam, B.E.
1990-01-01
Free-electron laser sources, driven by rf-linear accelerators, have the potential to operate in the extreme ultraviolet (XUV) spectral range with more than sufficient average power for high-volume projection lithography. For XUV wavelengths from 100 nm to 4 nm, such sources will enable the resolution limit of optical projection lithography to be extended from 0.25 {mu}m to 0.05{mu}m and with an adequate total depth of focus (1 to 2 {mu}m). Recent developments of a photoinjector of very bright electron beams, high-precision magnetic undulators, and ring-resonator cavities raise our confidence that FEL operation below 100 nm is ready for prototype demonstration. We address the motivation for an XUV FEL source for commercial microcircuit production and its integration into a lithographic system, include reflecting reduction masks, reflecting XUV projection optics and alignment systems, and surface-imaging photoresists. 52 refs., 7 figs.
Conductive polymer nanowire gas sensor fabricated by nanoscale soft lithography
Tang, Ning; Jiang, Yang; Qu, Hemi; Duan, Xuexin
2017-12-01
Resistive devices composed of one-dimensional nanostructures are promising candidates for the next generation of gas sensors. However, the large-scale fabrication of nanowires is still challenging, which restricts the commercialization of such devices. Here, we report a highly efficient and facile approach to fabricating poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (PEDOT:PSS) nanowire chemiresistive gas sensors by nanoscale soft lithography. Well-defined sub-100 nm nanowires are fabricated on silicon substrate, which facilitates device integration. The nanowire chemiresistive gas sensor is demonstrated for NH3 and NO2 detection at room temperature and shows a limit of detection at ppb level, which is compatible with nanoscale PEDOT:PSS gas sensors fabricated with the conventional lithography technique. In comparison with PEDOT:PSS thin-film gas sensors, the nanowire gas sensor exhibits higher sensitivity and a much faster response to gas molecules.
Soft X-ray microscopy and lithography with synchrotron radiation
International Nuclear Information System (INIS)
Gudat, W.
1977-12-01
Considerable progress in the technique microscopy with soft X-ray radiation has been achieved in particular through the application of synchrotron radiation. Various methods which are currently being studied theoretically or already being used practically will be described briefly. Attention is focussed on the method of contact microscopy. Various biological specimens have been investigated by this method with a resolution as good as 100 A. X-ray lithography which in the technical procedure is very similar to contact microscopy gives promise for the fabrication of high quality submicron structures in electronic device production. Important factors limiting the resolution and determining the performance of contact microscopy and X-ray lithography will be discussed. (orig.) [de
Challenges of anamorphic high-NA lithography and mask making
Hsu, Stephen D.; Liu, Jingjing
2017-06-01
Chip makers are actively working on the adoption of 0.33 numerical aperture (NA) EUV scanners for the 7-nm and 5-nm nodes (B. Turko, S. L. Carson, A. Lio, T. Liang, M. Phillips, et al., in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 977602 (2016) doi: 10.1117/12.2225014; A. Lio, in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97760V (2016) doi: 10.1117/12.2225017). In the meantime, leading foundries and integrated device manufacturers are starting to investigate patterning options beyond the 5-nm node (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022). To minimize the cost and process complexity of multiple patterning beyond the 5-nm node, EUV high-NA single-exposure patterning is a preferred method over EUV double patterning (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022; J. van Schoot, K. van Ingen Schenau, G. Bottiglieri, K. Troost, J. Zimmerman, et al., `Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97761I (2016) doi: 10.1117/12.2220150). The EUV high-NA scanner equipped with a projection lens of 0.55 NA is designed to support resolutions below 10 nm. The high-NA system is beneficial for enhancing resolution, minimizing mask proximity correction bias, improving normalized image log slope (NILS), and controlling CD uniformity (CDU). However, increasing NA from 0.33 to 0.55 reduces the depth of focus (DOF) significantly. Therefore, the source mask optimization (SMO) with sub-resolution assist features (SRAFs) are needed to increase DOF to meet the demanding full chip process control requirements (S. Hsu, R. Howell, J. Jia, H.-Y. Liu, K. Gronlund, et al., EUV `Proc. SPIE9048, Extreme Ultraviolet (EUV) Lithography VI', (2015) doi: 10
A spectral Poisson solver for kinetic plasma simulation
Szeremley, Daniel; Obberath, Jens; Brinkmann, Ralf
2011-10-01
Plasma resonance spectroscopy is a well established plasma diagnostic method, realized in several designs. One of these designs is the multipole resonance probe (MRP). In its idealized - geometrically simplified - version it consists of two dielectrically shielded, hemispherical electrodes to which an RF signal is applied. A numerical tool is under development which is capable of simulating the dynamics of the plasma surrounding the MRP in electrostatic approximation. In this contribution we concentrate on the specialized Poisson solver for that tool. The plasma is represented by an ensemble of point charges. By expanding both the charge density and the potential into spherical harmonics, a largely analytical solution of the Poisson problem can be employed. For a practical implementation, the expansion must be appropriately truncated. With this spectral solver we are able to efficiently solve the Poisson equation in a kinetic plasma simulation without the need of introducing a spatial discretization.
A high order solver for the unbounded Poisson equation
DEFF Research Database (Denmark)
Hejlesen, Mads Mølholm; Rasmussen, Johannes Tophøj; Chatelain, Philippe
In mesh-free particle methods a high order solution to the unbounded Poisson equation is usually achieved by constructing regularised integration kernels for the Biot-Savart law. Here the singular, point particles are regularised using smoothed particles to obtain an accurate solution with an order...... of convergence consistent with the moments conserved by the applied smoothing function. In the hybrid particle-mesh method of Hockney and Eastwood (HE) the particles are interpolated onto a regular mesh where the unbounded Poisson equation is solved by a discrete non-cyclic convolution of the mesh values...... and the integration kernel. In this work we show an implementation of high order regularised integration kernels in the HE algorithm for the unbounded Poisson equation to formally achieve an arbitrary high order convergence. We further present a quantitative study of the convergence rate to give further insight...
Markov modulated Poisson process models incorporating covariates for rainfall intensity.
Thayakaran, R; Ramesh, N I
2013-01-01
Time series of rainfall bucket tip times at the Beaufort Park station, Bracknell, in the UK are modelled by a class of Markov modulated Poisson processes (MMPP) which may be thought of as a generalization of the Poisson process. Our main focus in this paper is to investigate the effects of including covariate information into the MMPP model framework on statistical properties. In particular, we look at three types of time-varying covariates namely temperature, sea level pressure, and relative humidity that are thought to be affecting the rainfall arrival process. Maximum likelihood estimation is used to obtain the parameter estimates, and likelihood ratio tests are employed in model comparison. Simulated data from the fitted model are used to make statistical inferences about the accumulated rainfall in the discrete time interval. Variability of the daily Poisson arrival rates is studied.
Poisson-Fermi Formulation of Nonlocal Electrostatics in Electrolyte Solutions
Directory of Open Access Journals (Sweden)
Liu Jinn-Liang
2017-10-01
Full Text Available We present a nonlocal electrostatic formulation of nonuniform ions and water molecules with interstitial voids that uses a Fermi-like distribution to account for steric and correlation efects in electrolyte solutions. The formulation is based on the volume exclusion of hard spheres leading to a steric potential and Maxwell’s displacement field with Yukawa-type interactions resulting in a nonlocal electric potential. The classical Poisson-Boltzmann model fails to describe steric and correlation effects important in a variety of chemical and biological systems, especially in high field or large concentration conditions found in and near binding sites, ion channels, and electrodes. Steric effects and correlations are apparent when we compare nonlocal Poisson-Fermi results to Poisson-Boltzmann calculations in electric double layer and to experimental measurements on the selectivity of potassium channels for K+ over Na+.
The coupling of Poisson sigma models to topological backgrounds
Energy Technology Data Exchange (ETDEWEB)
Rosa, Dario [School of Physics, Korea Institute for Advanced Study,Seoul 02455 (Korea, Republic of)
2016-12-13
We extend the coupling to the topological backgrounds, recently worked out for the 2-dimensional BF-model, to the most general Poisson sigma models. The coupling involves the choice of a Casimir function on the target manifold and modifies the BRST transformations. This in turn induces a change in the BRST cohomology of the resulting theory. The observables of the coupled theory are analyzed and their geometrical interpretation is given. We finally couple the theory to 2-dimensional topological gravity: this is the first step to study a topological string theory in propagation on a Poisson manifold. As an application, we show that the gauge-fixed vectorial supersymmetry of the Poisson sigma models has a natural explanation in terms of the theory coupled to topological gravity.
Effect of Poisson noise on adiabatic quantum control
Kiely, A.; Muga, J. G.; Ruschhaupt, A.
2017-01-01
We present a detailed derivation of the master equation describing a general time-dependent quantum system with classical Poisson white noise and outline its various properties. We discuss the limiting cases of Poisson white noise and provide approximations for the different noise strength regimes. We show that using the eigenstates of the noise superoperator as a basis can be a useful way of expressing the master equation. Using this, we simulate various settings to illustrate different effects of Poisson noise. In particular, we show a dip in the fidelity as a function of noise strength where high fidelity can occur in the strong-noise regime for some cases. We also investigate recent claims [J. Jing et al., Phys. Rev. A 89, 032110 (2014), 10.1103/PhysRevA.89.032110] that this type of noise may improve rather than destroy adiabaticity.
Fabrication of Nano-pit Array Using Electron Beam Lithography
International Nuclear Information System (INIS)
Maryam Alsadat Rad; Kamarulazizi Ibrahim
2011-01-01
This work reports the fabrication of nano-pits array pattern using electron beam lithography (EBL). We investigated the effect of different electron beam dosage and acceleration voltage in fabrication nano-pits array pattern and effect of them on dimension of nano-pits. The SEM images have shown effect of the voltage and dosage variation on them and also the proximity effect. (author)
The superconducting x-ray lithography source program at Brookhaven
Energy Technology Data Exchange (ETDEWEB)
Williams, G. P.; Heese, R. N.; Vignola, G.; Murphy, J. B.; Godel, J. B.; Hsieh, H.; Galayda, J.; Seifert, A.; Knotek, M. L.
1989-07-01
A compact electron storage ring with superconducting dipole magnets, is being developed at the National Synchrotron Light Source at Brookhaven. The parameters of the source have been optimized for its future use as an x-ray source for lithography. This first ring is a prototype which will be used to study the operating characteristics of machines of this type with particular attention being paid to low-energy injection and long beam lifetime.
Topology optimization for optical projection lithography with manufacturing uncertainties
DEFF Research Database (Denmark)
Zhou, Mingdong; Lazarov, Boyan Stefanov; Sigmund, Ole
2014-01-01
to manufacturing without additional optical proximity correction (OPC). The performance of the optimized device is robust toward the considered process variations. With the proposed unified approach, the design for photolithography is achieved by considering the optimal device performance and manufacturability......This article presents a topology optimization approach for micro-and nano-devices fabricated by optical projection lithography. Incorporating the photolithography process and the manufacturing uncertainties into the topology optimization process results in a binary mask that can be sent directly...
32nm 1-D regular pitch SRAM bitcell design for interference-assisted lithography
Greenway, Robert T.; Jeong, Kwangok; Kahng, Andrew B.; Park, Chul-Hong; Petersen, John S.
2008-10-01
As optical lithography advances into the 45nm technology node and beyond, new manufacturing-aware design requirements have emerged. We address layout design for interference-assisted lithography (IAL), a double exposure method that combines maskless interference lithography (IL) and projection lithography (PL); cf. hybrid optical maskless lithography (HOMA) in [2] and [3]. Since IL can generate dense but regular pitch patterns, a key challenge to deployment of IAL is the conversion of existing designs to regular-linewidth, regular-pitch layouts. In this paper, we propose new 1-D regular pitch SRAM bitcell layouts which are amenable to IAL. We evaluate the feasibility of our bitcell designs via lithography simulations and circuit simulations, and confirm that the proposed bitcells can be successfully printed by IAL and that their electrical characteristics are comparable to those of existing bitcells.
Double generalized linear compound poisson models to insurance claims data
DEFF Research Database (Denmark)
Andersen, Daniel Arnfeldt; Bonat, Wagner Hugo
2017-01-01
This paper describes the specification, estimation and comparison of double generalized linear compound Poisson models based on the likelihood paradigm. The models are motivated by insurance applications, where the distribution of the response variable is composed by a degenerate distribution...... in a finite sample framework. The simulation studies are also used to validate the fitting algorithms and check the computational implementation. Furthermore, we investigate the impact of an unsuitable choice for the response variable distribution on both mean and dispersion parameter estimates. We provide R...... implementation and illustrate the application of double generalized linear compound Poisson models using a data set about car insurances....
Quadratic Hamiltonians on non-symmetric Poisson structures
International Nuclear Information System (INIS)
Arribas, M.; Blesa, F.; Elipe, A.
2007-01-01
Many dynamical systems may be represented in a set of non-canonical coordinates that generate an su(2) algebraic structure. The topology of the phase space is the one of the S 2 sphere, the Poisson structure is the one of the rigid body, and the Hamiltonian is a parametric quadratic form in these 'spherical' coordinates. However, there are other problems in which the Poisson structure losses its symmetry. In this paper we analyze this case and, we show how the loss of the spherical symmetry affects the phase flow and parametric bifurcations for the bi-parametric cases
Efficient triangulation of Poisson-disk sampled point sets
Guo, Jianwei
2014-05-06
In this paper, we present a simple yet efficient algorithm for triangulating a 2D input domain containing a Poisson-disk sampled point set. The proposed algorithm combines a regular grid and a discrete clustering approach to speedup the triangulation. Moreover, our triangulation algorithm is flexible and performs well on more general point sets such as adaptive, non-maximal Poisson-disk sets. The experimental results demonstrate that our algorithm is robust for a wide range of input domains and achieves significant performance improvement compared to the current state-of-the-art approaches. © 2014 Springer-Verlag Berlin Heidelberg.
Gyrokinetic energy conservation and Poisson-bracket formulation
International Nuclear Information System (INIS)
Brizard, A.
1988-11-01
An integral expression for the gyrokinetic total energy of a magnetized plasma with general magnetic field configuration perturbed by fully electromagnetic fields was recently derived through the use of a gyro-center Lie transformation. We show that the gyrokinetic energy is conserved by the gyrokinetic Hamiltonian flow to all orders in perturbed fields. This paper is concerned with the explicit demonstration that a gyrokinetic Hamiltonian containing quadratic nonlinearities preserves the gyrokinetic energy up to third order. The Poisson-bracket formulation greatly facilitates this demonstration with the help of the Jacobi identity and other properties of the Poisson brackets. 18 refs
Adaptive maximal poisson-disk sampling on surfaces
Yan, Dongming
2012-01-01
In this paper, we study the generation of maximal Poisson-disk sets with varying radii on surfaces. Based on the concepts of power diagram and regular triangulation, we present a geometric analysis of gaps in such disk sets on surfaces, which is the key ingredient of the adaptive maximal Poisson-disk sampling framework. Moreover, we adapt the presented sampling framework for remeshing applications. Several novel and efficient operators are developed for improving the sampling/meshing quality over the state-of-theart. © 2012 ACM.
Robust iterative observer for source localization for Poisson equation
Majeed, Muhammad Usman
2017-01-05
Source localization problem for Poisson equation with available noisy boundary data is well known to be highly sensitive to noise. The problem is ill posed and lacks to fulfill Hadamards stability criteria for well posedness. In this work, first a robust iterative observer is presented for boundary estimation problem for Laplace equation, and then this algorithm along with the available noisy boundary data from the Poisson problem is used to localize point sources inside a rectangular domain. The algorithm is inspired from Kalman filter design, however one of the space variables is used as time-like. Numerical implementation along with simulation results is detailed towards the end.
Efficient maximal Poisson-disk sampling and remeshing on surfaces
Guo, Jianwei
2015-02-01
Poisson-disk sampling is one of the fundamental research problems in computer graphics that has many applications. In this paper, we study the problem of maximal Poisson-disk sampling on mesh surfaces. We present a simple approach that generalizes the 2D maximal sampling framework to surfaces. The key observation is to use a subdivided mesh as the sampling domain for conflict checking and void detection. Our approach improves the state-of-the-art approach in efficiency, quality and the memory consumption.
Fabrication of 70nm split ring resonators by nanoimprint lithography
Sharp, Graham J.; Khokhar, Ali Z.; Johnson, Nigel P.
2012-05-01
We report on the fabrication of 70 nm wide, high resolution rectangular U-shaped split ring resonators (SRRs) using nanoimprint lithography (NIL). The fabrication method for the nanoimprint stamp does not require dry etching. The stamp is used to pattern SRRs in a thin PMMA layer followed by metal deposition and lift-off. Nanoimprinting in this way allows high resolution patterns with a minimum feature size of 20 nm. This fabrication technique yields a much higher throughput than conventional e-beam lithography and each stamp can be used numerous times to imprint patterns. Reflectance measurements of fabricated aluminium SRRs on silicon substrates show a so-called an LC resonance peak in the visible spectrum under transverse electric polarisation. Fabricating the SRRs by NIL rather than electron beam lithography allows them to be scaled to smaller dimensions without any significant loss in resolution, partly because pattern expansion caused by backscattered electrons and the proximity effect are not present with NIL. This in turn helps to shift the magnetic response to short wavelengths while still retaining a distinct LC peak.
Pixelated source and mask optimization for immersion lithography.
Ma, Xu; Han, Chunying; Li, Yanqiu; Dong, Lisong; Arce, Gonzalo R
2013-01-01
Immersion lithography systems with hyper-numerical aperture (hyper-NA) (NA>1) have become indispensable in nanolithography for technology nodes of 45 nm and beyond. Source and mask optimization (SMO) has emerged as a key technique used to further improve the imaging performance of immersion lithography. Recently, a set of pixelated gradient-based SMO approaches were proposed under the scalar imaging models, which are inaccurate for hyper-NA settings. This paper focuses on developing pixelated gradient-based SMO algorithms based on a vector imaging model that is accurate for current immersion lithography. To achieve this goal, an integrative and analytic vector imaging model is first used to formulate the simultaneous SMO (SISMO) and sequential SMO (SESMO) frameworks. A gradient-based algorithm is then exploited to jointly optimize the source and mask. Subsequently, this paper studies and compares the performance of individual source optimization (SO), individual mask optimization (MO), SISMO, and SESMO. Finally, a hybrid SMO (HSMO) approach is proposed to take full advantage of SO, SISMO, and MO, consequently achieving superior performance.
Ga+ beam lithography for nanoscale silicon reactive ion etching
Henry, M. D.; Shearn, M. J.; Chhim, B.; Scherer, A.
2010-06-01
By using a dry etch chemistry which relies on the highly preferential etching of silicon, over that of gallium (Ga), we show resist-free fabrication of precision, high aspect ratio nanostructures and microstructures in silicon using a focused ion beam (FIB) and an inductively coupled plasma reactive ion etcher (ICP-RIE). Silicon etch masks are patterned via Ga + ion implantation in a FIB and then anisotropically etched in an ICP-RIE using fluorinated etch chemistries. We determine the critical areal density of the implanted Ga layer in silicon required to achieve a desired etch depth for both a Pseudo Bosch (SF6/C4F8) and cryogenic fluorine (SF6/O2) silicon etching. High fidelity nanoscale structures down to 30 nm and high aspect ratio structures of 17:1 are demonstrated. Since etch masks may be patterned on uneven surfaces, we utilize this lithography to create multilayer structures in silicon. The linear selectivity versus implanted Ga density enables grayscale lithography. Limits on the ultimate resolution and selectivity of Ga lithography are also discussed.
Low Cost Lithography Tool for High Brightness LED Manufacturing
Energy Technology Data Exchange (ETDEWEB)
Andrew Hawryluk; Emily True
2012-06-30
The objective of this activity was to address the need for improved manufacturing tools for LEDs. Improvements include lower cost (both capital equipment cost reductions and cost-ofownership reductions), better automation and better yields. To meet the DOE objective of $1- 2/kilolumen, it will be necessary to develop these highly automated manufacturing tools. Lithography is used extensively in the fabrication of high-brightness LEDs, but the tools used to date are not scalable to high-volume manufacturing. This activity addressed the LED lithography process. During R&D and low volume manufacturing, most LED companies use contact-printers. However, several industries have shown that these printers are incompatible with high volume manufacturing and the LED industry needs to evolve to projection steppers. The need for projection lithography tools for LED manufacturing is identified in the Solid State Lighting Manufacturing Roadmap Draft, June 2009. The Roadmap states that Projection tools are needed by 2011. This work will modify a stepper, originally designed for semiconductor manufacturing, for use in LED manufacturing. This work addresses improvements to yield, material handling, automation and throughput for LED manufacturing while reducing the capital equipment cost.
Spot Welding of Honeycomb Structures
Cohal, V.
2017-08-01
Honeycomb structures are used to prepare meals water jet cutting machines for textile. These honeycomb structures are made of stainless steel sheet thickness of 0.1-0.2 mm. Corrugated sheet metal strips are between two gears with special tooth profile. Hexagonal cells for obtaining these strips are welded points between them. Spot welding device is three electrodes in the upper part, which carries three welding points across the width of the strip of corrugated sheet metal. Spot welding device filled with press and advance mechanisms. The paper presents the values of the regime for spot welding.
Multi-parameter full waveform inversion using Poisson
Oh, Juwon
2016-07-21
In multi-parameter full waveform inversion (FWI), the success of recovering each parameter is dependent on characteristics of the partial derivative wavefields (or virtual sources), which differ according to parameterisation. Elastic FWIs based on the two conventional parameterisations (one uses Lame constants and density; the other employs P- and S-wave velocities and density) have low resolution of gradients for P-wave velocities (or ). Limitations occur because the virtual sources for P-wave velocity or (one of the Lame constants) are related only to P-P diffracted waves, and generate isotropic explosions, which reduce the spatial resolution of the FWI for these parameters. To increase the spatial resolution, we propose a new parameterisation using P-wave velocity, Poisson\\'s ratio, and density for frequency-domain multi-parameter FWI for isotropic elastic media. By introducing Poisson\\'s ratio instead of S-wave velocity, the virtual source for the P-wave velocity generates P-S and S-S diffracted waves as well as P-P diffracted waves in the partial derivative wavefields for the P-wave velocity. Numerical examples of the cross-triangle-square (CTS) model indicate that the new parameterisation provides highly resolved descent directions for the P-wave velocity. Numerical examples of noise-free and noisy data synthesised for the elastic Marmousi-II model support the fact that the new parameterisation is more robust for noise than the two conventional parameterisations.
On covariant Poisson brackets in classical field theory
International Nuclear Information System (INIS)
Forger, Michael; Salles, Mário O.
2015-01-01
How to give a natural geometric definition of a covariant Poisson bracket in classical field theory has for a long time been an open problem—as testified by the extensive literature on “multisymplectic Poisson brackets,” together with the fact that all these proposals suffer from serious defects. On the other hand, the functional approach does provide a good candidate which has come to be known as the Peierls–De Witt bracket and whose construction in a geometrical setting is now well understood. Here, we show how the basic “multisymplectic Poisson bracket” already proposed in the 1970s can be derived from the Peierls–De Witt bracket, applied to a special class of functionals. This relation allows to trace back most (if not all) of the problems encountered in the past to ambiguities (the relation between differential forms on multiphase space and the functionals they define is not one-to-one) and also to the fact that this class of functionals does not form a Poisson subalgebra
Poisson processes on groups and Feynman path integrals
International Nuclear Information System (INIS)
Combe, P.; Rodriguez, R.; Sirugue-Collin, M.; Centre National de la Recherche Scientifique, 13 - Marseille; Sirugue, M.
1979-09-01
An expression is given for the perturbed evolution of a free evolution by gentle, possibly velocity dependent, potential, in terms of the expectation with respect to a Poisson process on a group. Various applications are given in particular to usual quantum mechanics but also to Fermi and spin systems
An application of the Autoregressive Conditional Poisson (ACP) model
CSIR Research Space (South Africa)
Holloway, Jennifer P
2010-11-01
Full Text Available When modelling count data that comes in the form of a time series, the static Poisson regression and standard time series models are often not appropriate. A current study therefore involves the evaluation of several observation-driven and parameter...
The Quantum Poisson Bracket and Transformation Theory in ...
Indian Academy of Sciences (India)
Home; Journals; Resonance – Journal of Science Education; Volume 8; Issue 8. The Quantum Poisson Bracket and Transformation Theory in Quantum Mechanics: Dirac's Early Work in Quantum Theory. Kamal Datta. General Article Volume 8 Issue 8 August 2003 pp 75-85 ...
A high order solver for the unbounded Poisson equation
DEFF Research Database (Denmark)
Hejlesen, Mads Mølholm; Rasmussen, Johannes Tophøj; Chatelain, Philippe
2012-01-01
This work improves upon Hockney and Eastwood's Fourier-based algorithm for the unbounded Poisson equation to formally achieve arbitrary high order of convergence without any additional computational cost. We assess the methodology on the kinematic relations between the velocity and vorticity fields....
Coefficient Inverse Problem for Poisson's Equation in a Cylinder
Solov'ev, V. V.
2011-01-01
The inverse problem of determining the coefficient on the right-hand side of Poisson's equation in a cylindrical domain is considered. The Dirichlet boundary value problem is studied. Two types of additional information (overdetermination) can be specified: (i) the trace of the solution to the
Modeling corporate defaults: Poisson autoregressions with exogenous covariates (PARX)
DEFF Research Database (Denmark)
Agosto, Arianna; Cavaliere, Guiseppe; Kristensen, Dennis
We develop a class of Poisson autoregressive models with additional covariates (PARX) that can be used to model and forecast time series of counts. We establish the time series properties of the models, including conditions for stationarity and existence of moments. These results are in turn used...
Is it safe to use Poisson statistics in nuclear spectrometry?
International Nuclear Information System (INIS)
Pomme, S.; Robouch, P.; Arana, G.; Eguskiza, M.; Maguregui, M.I.
2000-01-01
The boundary conditions in which Poisson statistics can be applied in nuclear spectrometry are investigated. Improved formulas for the uncertainty of nuclear counting with deadtime and pulse pileup are presented. A comparison is made between the expected statistical uncertainty for loss-free counting, fixed live-time and fixed real-time measurements. (author)
Nambu-Poisson reformulation of the finite dimensional dynamical systems
International Nuclear Information System (INIS)
Baleanu, D.; Makhaldiani, N.
1998-01-01
A system of nonlinear ordinary differential equations which in a particular case reduces to Volterra's system is introduced. We found in two simplest cases the complete sets of the integrals of motion using Nambu-Poisson reformulation of the Hamiltonian dynamics. In these cases we have solved the systems by quadratures
A Poisson type formula for Hardy classes on Heisenberg's group
Directory of Open Access Journals (Sweden)
Lopushansky O.V.
2010-06-01
Full Text Available The Hardy type class of complex functions with infinite many variables defined on the Schrodinger irreducible unitary orbit of reduced Heisenberg group, generated by the Gauss density, is investigated. A Poisson integral type formula for their analytic extensions on an open ball is established. Taylor coefficients for analytic extensions are described by the associatedsymmetric Fock space.
Subsonic Flow for the Multidimensional Euler-Poisson System
Bae, Myoungjean; Duan, Ben; Xie, Chunjing
2016-04-01
We establish the existence and stability of subsonic potential flow for the steady Euler-Poisson system in a multidimensional nozzle of a finite length when prescribing the electric potential difference on a non-insulated boundary from a fixed point at the exit, and prescribing the pressure at the exit of the nozzle. The Euler-Poisson system for subsonic potential flow can be reduced to a nonlinear elliptic system of second order. In this paper, we develop a technique to achieve a priori {C^{1,α}} estimates of solutions to a quasi-linear second order elliptic system with mixed boundary conditions in a multidimensional domain enclosed by a Lipschitz continuous boundary. In particular, we discovered a special structure of the Euler-Poisson system which enables us to obtain {C^{1,α}} estimates of the velocity potential and the electric potential functions, and this leads us to establish structural stability of subsonic flows for the Euler-Poisson system under perturbations of various data.
Poisson-generalized gamma empirical Bayes model for disease ...
African Journals Online (AJOL)
In spatial disease mapping, the use of Bayesian models of estimation technique is becoming popular for smoothing relative risks estimates for disease mapping. The most common Bayesian conjugate model for disease mapping is the Poisson-Gamma Model (PG). To explore further the activity of smoothing of relative risk ...
Inhibition in speed and concentration tests: The Poisson inhibition model
Smit, J.C.; Ven, A.H.G.S. van der
1995-01-01
A new model is presented to account for the reaction time fluctuations in concentration tests. The model is a natural generalization of an earlier model, the so-called Poisson-Erlang model, published by Pieters & van der Ven (1982). First, a description is given of the type of tasks for which the
Boundary singularity of Poisson and harmonic Bergman kernels
Czech Academy of Sciences Publication Activity Database
Engliš, Miroslav
2015-01-01
Roč. 429, č. 1 (2015), s. 233-272 ISSN 0022-247X R&D Projects: GA AV ČR IAA100190802 Institutional support: RVO:67985840 Keywords : harmonic Bergman kernel * Poisson kernel * pseudodifferential boundary operators Subject RIV: BA - General Mathematics Impact factor: 1.014, year: 2015 http://www.sciencedirect.com/science/article/pii/S0022247X15003170
Characterization and global analysis of a family of Poisson structures
Energy Technology Data Exchange (ETDEWEB)
Hernandez-Bermejo, Benito [Escuela Superior de Ciencias Experimentales y Tecnologia, Edificio Departamental II, Universidad Rey Juan Carlos, Calle Tulipan S/N, 28933 (Mostoles), Madrid (Spain)]. E-mail: benito.hernandez@urjc.es
2006-06-26
A three-dimensional family of solutions of the Jacobi equations for Poisson systems is characterized. In spite of its general form it is possible the explicit and global determination of its main features, such as the symplectic structure and the construction of the Darboux canonical form. Examples are given.
Wide-area traffic: The failure of Poisson modeling
Energy Technology Data Exchange (ETDEWEB)
Paxson, V.; Floyd, S.
1994-08-01
Network arrivals are often modeled as Poisson processes for analytic simplicity, even though a number of traffic studies have shown that packet interarrivals are not exponentially distributed. The authors evaluate 21 wide-area traces, investigating a number of wide-area TCP arrival processes (session and connection arrivals, FTPDATA connection arrivals within FTP sessions, and TELNET packet arrivals) to determine the error introduced by modeling them using Poisson processes. The authors find that user-initiated TCP session arrivals, such as remote-login and file-transfer, are well-modeled as Poisson processes with fixed hourly rates, but that other connection arrivals deviate considerably from Poisson; that modeling TELNET packet interarrivals as exponential grievously underestimates the burstiness of TELNET traffic, but using the empirical Tcplib[DJCME92] interarrivals preserves burstiness over many time scales; and that FTPDATA connection arrivals within FTP sessions come bunched into ``connection bursts``, the largest of which are so large that they completely dominate FTPDATA traffic. Finally, they offer some preliminary results regarding how the findings relate to the possible self-similarity of wide-area traffic.
Comparison between two bivariate Poisson distributions through the ...
African Journals Online (AJOL)
To remedy this problem, Berkhout and Plug proposed a bivariate Poisson distribution accepting the correlation as well negative, equal to zero, that positive. In this paper, we show that these models are nearly everywhere asymptotically equal. From this survey that the ø-divergence converges toward zero, both models are ...
On covariant Poisson brackets in classical field theory
Energy Technology Data Exchange (ETDEWEB)
Forger, Michael [Instituto de Matemática e Estatística, Universidade de São Paulo, Caixa Postal 66281, BR–05315-970 São Paulo, SP (Brazil); Salles, Mário O. [Instituto de Matemática e Estatística, Universidade de São Paulo, Caixa Postal 66281, BR–05315-970 São Paulo, SP (Brazil); Centro de Ciências Exatas e da Terra, Universidade Federal do Rio Grande do Norte, Campus Universitário – Lagoa Nova, BR–59078-970 Natal, RN (Brazil)
2015-10-15
How to give a natural geometric definition of a covariant Poisson bracket in classical field theory has for a long time been an open problem—as testified by the extensive literature on “multisymplectic Poisson brackets,” together with the fact that all these proposals suffer from serious defects. On the other hand, the functional approach does provide a good candidate which has come to be known as the Peierls–De Witt bracket and whose construction in a geometrical setting is now well understood. Here, we show how the basic “multisymplectic Poisson bracket” already proposed in the 1970s can be derived from the Peierls–De Witt bracket, applied to a special class of functionals. This relation allows to trace back most (if not all) of the problems encountered in the past to ambiguities (the relation between differential forms on multiphase space and the functionals they define is not one-to-one) and also to the fact that this class of functionals does not form a Poisson subalgebra.
Poisson sampling - The adjusted and unadjusted estimator revisited
Michael S. Williams; Hans T. Schreuder; Gerardo H. Terrazas
1998-01-01
The prevailing assumption, that for Poisson sampling the adjusted estimator "Y-hat a" is always substantially more efficient than the unadjusted estimator "Y-hat u" , is shown to be incorrect. Some well known theoretical results are applicable since "Y-hat a" is a ratio-of-means estimator and "Y-hat u" a simple unbiased estimator...
Poisson Regression Analysis of Illness and Injury Surveillance Data
Energy Technology Data Exchange (ETDEWEB)
Frome E.L., Watkins J.P., Ellis E.D.
2012-12-12
The Department of Energy (DOE) uses illness and injury surveillance to monitor morbidity and assess the overall health of the work force. Data collected from each participating site include health events and a roster file with demographic information. The source data files are maintained in a relational data base, and are used to obtain stratified tables of health event counts and person time at risk that serve as the starting point for Poisson regression analysis. The explanatory variables that define these tables are age, gender, occupational group, and time. Typical response variables of interest are the number of absences due to illness or injury, i.e., the response variable is a count. Poisson regression methods are used to describe the effect of the explanatory variables on the health event rates using a log-linear main effects model. Results of fitting the main effects model are summarized in a tabular and graphical form and interpretation of model parameters is provided. An analysis of deviance table is used to evaluate the importance of each of the explanatory variables on the event rate of interest and to determine if interaction terms should be considered in the analysis. Although Poisson regression methods are widely used in the analysis of count data, there are situations in which over-dispersion occurs. This could be due to lack-of-fit of the regression model, extra-Poisson variation, or both. A score test statistic and regression diagnostics are used to identify over-dispersion. A quasi-likelihood method of moments procedure is used to evaluate and adjust for extra-Poisson variation when necessary. Two examples are presented using respiratory disease absence rates at two DOE sites to illustrate the methods and interpretation of the results. In the first example the Poisson main effects model is adequate. In the second example the score test indicates considerable over-dispersion and a more detailed analysis attributes the over-dispersion to extra-Poisson
Seasonally adjusted birth frequencies follow the Poisson distribution.
Barra, Mathias; Lindstrøm, Jonas C; Adams, Samantha S; Augestad, Liv A
2015-12-15
Variations in birth frequencies have an impact on activity planning in maternity wards. Previous studies of this phenomenon have commonly included elective births. A Danish study of spontaneous births found that birth frequencies were well modelled by a Poisson process. Somewhat unexpectedly, there were also weekly variations in the frequency of spontaneous births. Another study claimed that birth frequencies follow the Benford distribution. Our objective was to test these results. We analysed 50,017 spontaneous births at Akershus University Hospital in the period 1999-2014. To investigate the Poisson distribution of these births, we plotted their variance over a sliding average. We specified various Poisson regression models, with the number of births on a given day as the outcome variable. The explanatory variables included various combinations of years, months, days of the week and the digit sum of the date. The relationship between the variance and the average fits well with an underlying Poisson process. A Benford distribution was disproved by a goodness-of-fit test (p variables is significantly improved (p variable. Altogether 7.5% more children are born on Tuesdays than on Sundays. The digit sum of the date is non-significant as an explanatory variable (p = 0.23), nor does it increase the explained variance. INERPRETATION: Spontaneous births are well modelled by a time-dependent Poisson process when monthly and day-of-the-week variation is included. The frequency is highest in summer towards June and July, Friday and Tuesday stand out as particularly busy days, and the activity level is at its lowest during weekends.
Poisson traces, D-modules, and symplectic resolutions
Etingof, Pavel; Schedler, Travis
2018-03-01
We survey the theory of Poisson traces (or zeroth Poisson homology) developed by the authors in a series of recent papers. The goal is to understand this subtle invariant of (singular) Poisson varieties, conditions for it to be finite-dimensional, its relationship to the geometry and topology of symplectic resolutions, and its applications to quantizations. The main technique is the study of a canonical D-module on the variety. In the case the variety has finitely many symplectic leaves (such as for symplectic singularities and Hamiltonian reductions of symplectic vector spaces by reductive groups), the D-module is holonomic, and hence, the space of Poisson traces is finite-dimensional. As an application, there are finitely many irreducible finite-dimensional representations of every quantization of the variety. Conjecturally, the D-module is the pushforward of the canonical D-module under every symplectic resolution of singularities, which implies that the space of Poisson traces is dual to the top cohomology of the resolution. We explain many examples where the conjecture is proved, such as symmetric powers of du Val singularities and symplectic surfaces and Slodowy slices in the nilpotent cone of a semisimple Lie algebra. We compute the D-module in the case of surfaces with isolated singularities and show it is not always semisimple. We also explain generalizations to arbitrary Lie algebras of vector fields, connections to the Bernstein-Sato polynomial, relations to two-variable special polynomials such as Kostka polynomials and Tutte polynomials, and a conjectural relationship with deformations of symplectic resolutions. In the appendix we give a brief recollection of the theory of D-modules on singular varieties that we require.
Poisson structure of dynamical systems with three degrees of freedom
Gümral, Hasan; Nutku, Yavuz
1993-12-01
It is shown that the Poisson structure of dynamical systems with three degrees of freedom can be defined in terms of an integrable one-form in three dimensions. Advantage is taken of this fact and the theory of foliations is used in discussing the geometrical structure underlying complete and partial integrability. Techniques for finding Poisson structures are presented and applied to various examples such as the Halphen system which has been studied as the two-monopole problem by Atiyah and Hitchin. It is shown that the Halphen system can be formulated in terms of a flat SL(2,R)-valued connection and belongs to a nontrivial Godbillon-Vey class. On the other hand, for the Euler top and a special case of three-species Lotka-Volterra equations which are contained in the Halphen system as limiting cases, this structure degenerates into the form of globally integrable bi-Hamiltonian structures. The globally integrable bi-Hamiltonian case is a linear and the SL(2,R) structure is a quadratic unfolding of an integrable one-form in 3+1 dimensions. It is shown that the existence of a vector field compatible with the flow is a powerful tool in the investigation of Poisson structure and some new techniques for incorporating arbitrary constants into the Poisson one-form are presented herein. This leads to some extensions, analogous to q extensions, of Poisson structure. The Kermack-McKendrick model and some of its generalizations describing the spread of epidemics, as well as the integrable cases of the Lorenz, Lotka-Volterra, May-Leonard, and Maxwell-Bloch systems admit globally integrable bi-Hamiltonian structure.
Imbalance aware lithography hotspot detection: a deep learning approach
Yang, Haoyu; Luo, Luyang; Su, Jing; Lin, Chenxi; Yu, Bei
2017-07-01
With the advancement of very large scale integrated circuits (VLSI) technology nodes, lithographic hotspots become a serious problem that affects manufacture yield. Lithography hotspot detection at the post-OPC stage is imperative to check potential circuit failures when transferring designed patterns onto silicon wafers. Although conventional lithography hotspot detection methods, such as machine learning, have gained satisfactory performance, with the extreme scaling of transistor feature size and layout patterns growing in complexity, conventional methodologies may suffer from performance degradation. For example, manual or ad hoc feature extraction in a machine learning framework may lose important information when predicting potential errors in ultra-large-scale integrated circuit masks. We present a deep convolutional neural network (CNN) that targets representative feature learning in lithography hotspot detection. We carefully analyze the impact and effectiveness of different CNN hyperparameters, through which a hotspot-detection-oriented neural network model is established. Because hotspot patterns are always in the minority in VLSI mask design, the training dataset is highly imbalanced. In this situation, a neural network is no longer reliable, because a trained model with high classification accuracy may still suffer from a high number of false negative results (missing hotspots), which is fatal in hotspot detection problems. To address the imbalance problem, we further apply hotspot upsampling and random-mirror flipping before training the network. Experimental results show that our proposed neural network model achieves comparable or better performance on the ICCAD 2012 contest benchmark compared to state-of-the-art hotspot detectors based on deep or representative machine leaning.
Durable diamond-like carbon templates for UV nanoimprint lithography
International Nuclear Information System (INIS)
Tao, L; Ramachandran, S; Nelson, C T; Overzet, L J; Goeckner, M; Lee, G; Hu, W; Lin, M; Willson, C G; Wu, W
2008-01-01
The interaction between resist and template during the separation process after nanoimprint lithography (NIL) can cause the formation of defects and damage to the templates and resist patterns. To alleviate these problems, fluorinated self-assembled monolayers (F-SAMs, i.e. tridecafluoro-1,1,2,2,tetrahydrooctyl trichlorosilane or FDTS) have been employed as template release coatings. However, we find that the FDTS coating undergoes irreversible degradation after only 10 cycles of UV nanoimprint processes with SU-8 resist. The degradation includes a 28% reduction in surface F atoms and significant increases in the surface roughness. In this paper, diamond-like carbon (DLC) films were investigated as an alternative material not only for coating but also for direct fabrication of nanoimprint templates. DLC films deposited on quartz templates in a plasma enhanced chemical vapor deposition system are shown to have better chemical and physical stability than FDTS. After the same 10 cycles of UV nanoimprints, the surface composition as well as the roughness of DLC films were found to be unchanged. The adhesion energy between the DLC surface and SU-8 is found to be smaller than that of FDTS despite the slightly higher total surface energy of DLC. DLC templates with 40 nm features were fabricated using e-beam lithography followed by Cr lift-off and reactive ion etching. UV nanoimprinting using the directly patterned DLC templates in SU-8 resist demonstrates good pattern transfer fidelity and easy template-resist separation. These results indicate that DLC is a promising material for fabricating durable templates for UV nanoimprint lithography
Advanced laser driver for soft x-ray projection lithography
Energy Technology Data Exchange (ETDEWEB)
Zapata, L.E.; Beach, R.J.; Dane, C.B.; Reichert, P.; Honig, J.N.; Hackel, L.A.
1994-03-01
A diode-pumped Nd:YAG laser for use as a driver for a soft x-ray projection lithography system is described. The laser will output 0.5 to 1 J per pulse with about 5 ns pulse width at up to 1.5 kHz repetition frequency. The design employs microchannel-cooled diode laser arrays for optical pumping, zigzag slab energy storage, and a single frequency oscillator injected regenerative amplifier cavity using phase conjugator beam correction for near diffraction limited beam quality. The design and initial results of this laser`s activation experiments will be presented.
Combined electron beam and UV lithography in SU-8
DEFF Research Database (Denmark)
Gersborg-Hansen, Morten; Thamdrup, Lasse Højlund; Mironov, Andrej
2007-01-01
We present combined electron beam and UV lithography (CEUL) in SU-8 as a fast and flexible lithographic technique for prototyping of functional polymer devices and pattern transfer applications. CEUL is a lithographic technique suitable for defining both micrometer and nanometer scale features...... in a single polymer film on the wafer scale. The height of the micrometer and nanometer scale features is matched within 30 nm. As a pattern transfer application, we demonstrate stamp fabrication and thermal nanoimprint of a 2-dimensional array of 100 nm wide lines with a pitch of 380 nm in connection...
Resin Elongation Phenomenon of Polystyrene Nanopillars in Nanoimprint Lithography
Kuwabara, Kosuke; Miyauchi, Akihiro; Sugimura, Hiroyuki
2010-10-01
We investigated the elongation of polystyrene nanopillars formed by thermal nanoimprint lithography. Silicone and perfluoropolyether were used as mold release agents to obtain molds with different adhesion forces against polystyrene to be imprinted. The adhesion force between the resin and release layers was evaluated as a force curve by atomic force microscope with a polystyrene colloid probe. Elongation depended on the aspect ratio of the corresponding microholes on the mold and the adhesion force against the release layer. The conditions under which the elongation occurred exhibited a clear threshold on the stress loaded on the foot area of the nanopillars.
Masks for high aspect ratio x-ray lithography
International Nuclear Information System (INIS)
Malek, C.K.; Jackson, K.H.; Bonivert, W.D.; Hruby, J.
1997-01-01
Fabrication of very high aspect ratio microstructures, as well as ultra-high precision manufacturing is of increasing interest in a multitude of applications. Fields as diverse as micromechanics, robotics, integrated optics, and sensors benefit from this technology. The scale-length of this spatial regime is between what can be achieved using classical machine tool operations and that which is used in microelectronics. This requires new manufacturing techniques, such as the LIGA process, which combines x-ray lithography, electroforming, and plastic molding
Combined e-beam lithography using different energies
Czech Academy of Sciences Publication Activity Database
Krátký, Stanislav; Kolařík, Vladimír; Horáček, Miroslav; Meluzín, Petr; Král, Stanislav
2017-01-01
Roč. 177, JUN (2017), s. 30-34 ISSN 0167-9317 R&D Projects: GA TA ČR TE01020233; GA MŠk(CZ) LO1212; GA MŠk ED0017/01/01 Institutional support: RVO:68081731 Keywords : grayscale e-beam lithography * mix and match process * absorbed energy density * resist sensitivity * micro-optical elements Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering OBOR OECD: Nano-processes (applications on nano-scale) Impact factor: 1.806, year: 2016
Energy effective dual-pulse bispectral laser for EUV lithography
Zhevlakov, A. P.; Seisyan, R. P.; Bespalov, V. G.; Elizarov, V. V.; Grishkanich, A. S.; Kascheev, S. V.; Sidorov, I. S.
2016-03-01
The power consumption in the two-pulse bispectral primary source could be substantially decreased by replacing the SRS converters from 1.06 μm into 10.6 μm wavelength as the preamplifier cascades in CO2 laser channel at the same efficiency radiation of EUV source. The creation of high volume manufacturing lithography facilities with the technological standard of 10-20 nm is related to the implementation of resist exposure modes with pulse repetition rate of 100 kHz. Low power consumption of the proposed scheme makes it promising for the creation of LPP EUV sources.
2010-01-01
... 9 Animals and Animal Products 1 2010-01-01 2010-01-01 false Spot audit. 149.4 Section 149.4... LIVESTOCK IMPROVEMENT VOLUNTARY TRICHINAE CERTIFICATION PROGRAM § 149.4 Spot audit. (a) In addition to regularly scheduled site audits, certified production sites will be subject to spot audits. (1) Random spot...
2D sigma models and differential Poisson algebras
Energy Technology Data Exchange (ETDEWEB)
Arias, Cesar [Departamento de Ciencias Físicas, Universidad Andres Bello,Republica 220, Santiago (Chile); Boulanger, Nicolas [Service de Mécanique et Gravitation, Université de Mons - UMONS,20 Place du Parc, 7000 Mons (Belgium); Laboratoire de Mathématiques et Physique Théorique,Unité Mixte de Recherche 7350 du CNRS, Fédération de Recherche 2964 Denis Poisson,Université François Rabelais, Parc de Grandmont, 37200 Tours (France); Sundell, Per [Departamento de Ciencias Físicas, Universidad Andres Bello,Republica 220, Santiago (Chile); Torres-Gomez, Alexander [Departamento de Ciencias Físicas, Universidad Andres Bello,Republica 220, Santiago (Chile); Instituto de Ciencias Físicas y Matemáticas, Universidad Austral de Chile-UACh,Valdivia (Chile)
2015-08-18
We construct a two-dimensional topological sigma model whose target space is endowed with a Poisson algebra for differential forms. The model consists of an equal number of bosonic and fermionic fields of worldsheet form degrees zero and one. The action is built using exterior products and derivatives, without any reference to a worldsheet metric, and is of the covariant Hamiltonian form. The equations of motion define a universally Cartan integrable system. In addition to gauge symmetries, the model has one rigid nilpotent supersymmetry corresponding to the target space de Rham operator. The rigid and local symmetries of the action, respectively, are equivalent to the Poisson bracket being compatible with the de Rham operator and obeying graded Jacobi identities. We propose that perturbative quantization of the model yields a covariantized differential star product algebra of Kontsevich type. We comment on the resemblance to the topological A model.
A dictionary learning approach for Poisson image deblurring.
Ma, Liyan; Moisan, Lionel; Yu, Jian; Zeng, Tieyong
2013-07-01
The restoration of images corrupted by blur and Poisson noise is a key issue in medical and biological image processing. While most existing methods are based on variational models, generally derived from a maximum a posteriori (MAP) formulation, recently sparse representations of images have shown to be efficient approaches for image recovery. Following this idea, we propose in this paper a model containing three terms: a patch-based sparse representation prior over a learned dictionary, the pixel-based total variation regularization term and a data-fidelity term capturing the statistics of Poisson noise. The resulting optimization problem can be solved by an alternating minimization technique combined with variable splitting. Extensive experimental results suggest that in terms of visual quality, peak signal-to-noise ratio value and the method noise, the proposed algorithm outperforms state-of-the-art methods.
Invariants and labels for Lie-Poisson Systems
International Nuclear Information System (INIS)
Thiffeault, J.L.; Morrison, P.J.
1998-04-01
Reduction is a process that uses symmetry to lower the order of a Hamiltonian system. The new variables in the reduced picture are often not canonical: there are no clear variables representing positions and momenta, and the Poisson bracket obtained is not of the canonical type. Specifically, we give two examples that give rise to brackets of the noncanonical Lie-Poisson form: the rigid body and the two-dimensional ideal fluid. From these simple cases, we then use the semidirect product extension of algebras to describe more complex physical systems. The Casimir invariants in these systems are examined, and some are shown to be linked to the recovery of information about the configuration of the system. We discuss a case in which the extension is not a semidirect product, namely compressible reduced MHD, and find for this case that the Casimir invariants lend partial information about the configuration of the system
Reference manual for the POISSON/SUPERFISH Group of Codes
Energy Technology Data Exchange (ETDEWEB)
1987-01-01
The POISSON/SUPERFISH Group codes were set up to solve two separate problems: the design of magnets and the design of rf cavities in a two-dimensional geometry. The first stage of either problem is to describe the layout of the magnet or cavity in a way that can be used as input to solve the generalized Poisson equation for magnets or the Helmholtz equations for cavities. The computer codes require that the problems be discretized by replacing the differentials (dx,dy) by finite differences ({delta}X,{delta}Y). Instead of defining the function everywhere in a plane, the function is defined only at a finite number of points on a mesh in the plane.
Bering's proposal for boundary contribution to the Poisson bracket
International Nuclear Information System (INIS)
Soloviev, V.O.
1998-11-01
It is shown that the Poisson bracket with boundary terms recently proposed by Bering can be deduced from the Poisson bracket proposed by the present author if one omits terms free of Euler-Lagrange derivatives (''annihilation principle''). This corresponds to another definition of the formal product of distributions (or, saying it in other words, to another definition of the pairing between 1-forms and 1-vectors in the formal variational calculus). We extend the formula initially suggested by Bering only for the ultralocal case with constant coefficients onto the general non-ultralocal brackets with coefficients depending on fields and their spatial derivatives. The lack of invariance under changes of dependent variables (field redefinitions) seems a drawback of this proposal. (author)
Exponential Stability of Stochastic Systems with Delay and Poisson Jumps
Directory of Open Access Journals (Sweden)
Wenli Zhu
2014-01-01
Full Text Available This paper focuses on the model of a class of nonlinear stochastic delay systems with Poisson jumps based on Lyapunov stability theory, stochastic analysis, and inequality technique. The existence and uniqueness of the adapted solution to such systems are proved by applying the fixed point theorem. By constructing a Lyapunov function and using Doob’s martingale inequality and Borel-Cantelli lemma, sufficient conditions are given to establish the exponential stability in the mean square of such systems, and we prove that the exponentially stable in the mean square of such systems implies the almost surely exponentially stable. The obtained results show that if stochastic systems is exponentially stable and the time delay is sufficiently small, then the corresponding stochastic delay systems with Poisson jumps will remain exponentially stable, and time delay upper limit is solved by using the obtained results when the system is exponentially stable, and they are more easily verified and applied in practice.
Improved mesh generator for the POISSON Group Codes
International Nuclear Information System (INIS)
Gupta, R.C.
1987-01-01
This paper describes the improved mesh generator of the POISSON Group Codes. These improvements enable one to have full control over the way the mesh is generated and in particular the way the mesh density is distributed throughout this model. A higher mesh density in certain regions coupled with a successively lower mesh density in others keeps the accuracy of the field computation high and the requirements on the computer time and computer memory low. The mesh is generated with the help of codes AUTOMESH and LATTICE; both have gone through a major upgrade. Modifications have also been made in the POISSON part of these codes. We shall present an example of a superconducting dipole magnet to explain how to use this code. The results of field computations are found to be reliable within a few parts in a hundred thousand even in such complex geometries
An adaptive fast multipole accelerated Poisson solver for complex geometries
Askham, T.; Cerfon, A. J.
2017-09-01
We present a fast, direct and adaptive Poisson solver for complex two-dimensional geometries based on potential theory and fast multipole acceleration. More precisely, the solver relies on the standard decomposition of the solution as the sum of a volume integral to account for the source distribution and a layer potential to enforce the desired boundary condition. The volume integral is computed by applying the FMM on a square box that encloses the domain of interest. For the sake of efficiency and convergence acceleration, we first extend the source distribution (the right-hand side in the Poisson equation) to the enclosing box as a C0 function using a fast, boundary integral-based method. We demonstrate on multiply connected domains with irregular boundaries that this continuous extension leads to high accuracy without excessive adaptive refinement near the boundary and, as a result, to an extremely efficient "black box" fast solver.
International Nuclear Information System (INIS)
Tang, F.
1983-01-01
Mount Wilson sunspot drawings from 1966 through 1980 were used in conjunction with Hα filtergrams from Big Bear Solar Observatory to examine the origin of delta spots, spots with bipolar umbrae within one penumbra. Of the six cases we studied, five were formed by the union of non-paired spots. They are either shoved into one another by two neighboring growing bipoles or by a new spot born piggy-back style on an existing spot of opposite polarity. Proper motions of the growing spots take on curvilinear paths around one another to avoid a collision. This is the shear motion observed in delta spots (Tanaka, 1979). In the remaining case, the delta spot was formed by spots that emerged as a pair. Our findings indicate no intrinsic differences in the formation or the behavior between delta spots of normal magnetic configuration. (orig.)
Investigation of Random Switching Driven by a Poisson Point Process
DEFF Research Database (Denmark)
Simonsen, Maria; Schiøler, Henrik; Leth, John-Josef
2015-01-01
This paper investigates the switching mechanism of a two-dimensional switched system, when the switching events are generated by a Poisson point process. A model, in the shape of a stochastic process, for such a system is derived and the distribution of the trajectory's position is developed...... together with marginal density functions for the coordinate functions. Furthermore, the joint probability distribution is given explicitly....
Estimating small signals by using maximum likelihood and Poisson statistics
Hannam, M D
1999-01-01
Estimation of small signals from counting experiments with backgrounds larger than signals is solved using maximum likelihood estimation for situations in which both signal and background statistics are Poissonian. Confidence levels are discussed, and Poisson, Gauss and least-squares fitting methods are compared. Efficient algorithms that estimate signal strengths and confidence levels are devised for computer implementation. Examples from simulated data and a low count rate experiment in nuclear physics are given. (author)
Events in time: Basic analysis of Poisson data
Energy Technology Data Exchange (ETDEWEB)
Engelhardt, M.E.
1994-09-01
The report presents basic statistical methods for analyzing Poisson data, such as the member of events in some period of time. It gives point estimates, confidence intervals, and Bayesian intervals for the rate of occurrence per unit of time. It shows how to compare subsets of the data, both graphically and by statistical tests, and how to look for trends in time. It presents a compound model when the rate of occurrence varies randomly. Examples and SAS programs are given.
A hybrid sampler for Poisson-Kingman mixture models
Lomeli, M.; Favaro, S.; Teh, Y. W.
2015-01-01
This paper concerns the introduction of a new Markov Chain Monte Carlo scheme for posterior sampling in Bayesian nonparametric mixture models with priors that belong to the general Poisson-Kingman class. We present a novel compact way of representing the infinite dimensional component of the model such that while explicitly representing this infinite component it has less memory and storage requirements than previous MCMC schemes. We describe comparative simulation results demonstrating the e...
A generalized Poisson solver for first-principles device simulations
Energy Technology Data Exchange (ETDEWEB)
Bani-Hashemian, Mohammad Hossein; VandeVondele, Joost, E-mail: joost.vandevondele@mat.ethz.ch [Nanoscale Simulations, ETH Zürich, 8093 Zürich (Switzerland); Brück, Sascha; Luisier, Mathieu [Integrated Systems Laboratory, ETH Zürich, 8092 Zürich (Switzerland)
2016-01-28
Electronic structure calculations of atomistic systems based on density functional theory involve solving the Poisson equation. In this paper, we present a plane-wave based algorithm for solving the generalized Poisson equation subject to periodic or homogeneous Neumann conditions on the boundaries of the simulation cell and Dirichlet type conditions imposed at arbitrary subdomains. In this way, source, drain, and gate voltages can be imposed across atomistic models of electronic devices. Dirichlet conditions are enforced as constraints in a variational framework giving rise to a saddle point problem. The resulting system of equations is then solved using a stationary iterative method in which the generalized Poisson operator is preconditioned with the standard Laplace operator. The solver can make use of any sufficiently smooth function modelling the dielectric constant, including density dependent dielectric continuum models. For all the boundary conditions, consistent derivatives are available and molecular dynamics simulations can be performed. The convergence behaviour of the scheme is investigated and its capabilities are demonstrated.
Poisson-Like Spiking in Circuits with Probabilistic Synapses
Moreno-Bote, Rubén
2014-01-01
Neuronal activity in cortex is variable both spontaneously and during stimulation, and it has the remarkable property that it is Poisson-like over broad ranges of firing rates covering from virtually zero to hundreds of spikes per second. The mechanisms underlying cortical-like spiking variability over such a broad continuum of rates are currently unknown. We show that neuronal networks endowed with probabilistic synaptic transmission, a well-documented source of variability in cortex, robustly generate Poisson-like variability over several orders of magnitude in their firing rate without fine-tuning of the network parameters. Other sources of variability, such as random synaptic delays or spike generation jittering, do not lead to Poisson-like variability at high rates because they cannot be sufficiently amplified by recurrent neuronal networks. We also show that probabilistic synapses predict Fano factor constancy of synaptic conductances. Our results suggest that synaptic noise is a robust and sufficient mechanism for the type of variability found in cortex. PMID:25032705
Brain, music, and non-Poisson renewal processes
Bianco, Simone; Ignaccolo, Massimiliano; Rider, Mark S.; Ross, Mary J.; Winsor, Phil; Grigolini, Paolo
2007-06-01
In this paper we show that both music composition and brain function, as revealed by the electroencephalogram (EEG) analysis, are renewal non-Poisson processes living in the nonergodic dominion. To reach this important conclusion we process the data with the minimum spanning tree method, so as to detect significant events, thereby building a sequence of times, which is the time series to analyze. Then we show that in both cases, EEG and music composition, these significant events are the signature of a non-Poisson renewal process. This conclusion is reached using a technique of statistical analysis recently developed by our group, the aging experiment (AE). First, we find that in both cases the distances between two consecutive events are described by nonexponential histograms, thereby proving the non-Poisson nature of these processes. The corresponding survival probabilities Ψ(t) are well fitted by stretched exponentials [ Ψ(t)∝exp (-(γt)α) , with 0.5music composition yield μmusic on the human brain.
Optimal smoothing of poisson degraded nuclear medicine image data
International Nuclear Information System (INIS)
Hull, D.M.
1985-01-01
The development of a method that removes Poisson noise from nuclear medicine studies will have significant impact on the quantitative analysis and clinical reliability of these data. The primary objective of the work described in this thesis was to develop a linear, non-stationary optimal filter to reduce Poisson noise. The derived filter is automatically calculated from a large group (library) of similar patient studies representing all similarly acquired studies (the ensemble). The filter design was evaluated under controlled conditions using two computer simulated ensembles, devised to represent selected properties of real patient gated blood pool studies. Fortran programs were developed to generate libraries of Poisson degraded simulated studies for each ensemble. These libraries then were used to estimate optimal filters specific to the ensemble. Libraries of previously acquired patient gated blood pool studies then were used to estimate the optimal filters for an ensemble of similarly acquired gated blood pool studies. These filters were applied to studies of 13 patients who received multiple repeat studies at one time. Comparisons of both the filtered and raw data to averages of the repeat studies demonstrated that the optimal filters, calculated from a library of 800 studies, reduce the mean square error in the patient data by 60%. It is expected that optimally filtered gated blood pool studies will improve quantitative analysis of the data
Blind beam-hardening correction from Poisson measurements
Gu, Renliang; Dogandžić, Aleksandar
2016-02-01
We develop a sparse image reconstruction method for Poisson-distributed polychromatic X-ray computed tomography (CT) measurements under the blind scenario where the material of the inspected object and the incident energy spectrum are unknown. We employ our mass-attenuation spectrum parameterization of the noiseless measurements and express the mass- attenuation spectrum as a linear combination of B-spline basis functions of order one. A block coordinate-descent algorithm is developed for constrained minimization of a penalized Poisson negative log-likelihood (NLL) cost function, where constraints and penalty terms ensure nonnegativity of the spline coefficients and nonnegativity and sparsity of the density map image; the image sparsity is imposed using a convex total-variation (TV) norm penalty term. This algorithm alternates between a Nesterov's proximal-gradient (NPG) step for estimating the density map image and a limited-memory Broyden-Fletcher-Goldfarb-Shanno with box constraints (L-BFGS-B) step for estimating the incident-spectrum parameters. To accelerate convergence of the density- map NPG steps, we apply function restart and a step-size selection scheme that accounts for varying local Lipschitz constants of the Poisson NLL. Real X-ray CT reconstruction examples demonstrate the performance of the proposed scheme.
The DARPA compact Superconducting X-Ray Lithography Source features
International Nuclear Information System (INIS)
Heese, R.; Kalsi, S.; Leung, E.
1991-01-01
Under DARPA sponsorship, a compact Superconducting X-Ray Lithography Source (SXLS) is being designed and built by the Brookhaven National Laboratory (BNL) with industry participation from Grumman Corporation and General Dynamics. This source is optimized for lithography work for sub-micron high density computer chips, and is about the size of a billiard table (1.5 m x 4.0 m). The machine has a racetrack configuration with two 180 degree bending magnets being designed and built by General Dynamics under a subcontract with Grumman Corporation. The machine will have 18 photon ports which would deliver light peaked at a wave length of 10 Angstroms. Grumman is commercializing the SXLS device and plans to book orders for delivery of industrialized SXLS (ISXLS) versions in 1995. This paper will describe the major features of this device. The commercial machine will be equipped with a fully automated user-friendly control systems, major features of which are already working on a compact warm dipole ring at BNL. This ring has normal dipole magnets with dimensions identical to the SXLS device, and has been successfully commissioned
Plasmonic Lithography Utilizing Epsilon Near Zero Hyperbolic Metamaterial.
Chen, Xi; Zhang, Cheng; Yang, Fan; Liang, Gaofeng; Li, Qiaochu; Guo, L Jay
2017-10-24
In this work, a special hyperbolic metamaterial (HMM) metamaterial is investigated for plasmonic lithography of period reduction patterns. It is a type II HMM (ϵ ∥ 0) whose tangential component of the permittivity ϵ ∥ is close to zero. Due to the high anisotropy of the type II epsilon-near-zero (ENZ) HMM, only one plasmonic mode can propagate horizontally with low loss in a waveguide system with ENZ HMM as its core. This work takes the advantage of a type II ENZ HMM composed of aluminum/aluminum oxide films and the associated unusual mode to expose a photoresist layer in a specially designed lithography system. Periodic patterns with a half pitch of 58.3 nm were achieved due to the interference of third-order diffracted light of the grating. The lines were 1/6 of the mask with a period of 700 nm and ∼1/7 of the wavelength of the incident light. Moreover, the theoretical analyses performed are widely applicable to structures made of different materials such as silver as well as systems working at deep ultraviolet wavelengths including 193, 248, and 365 nm.
Fabrication of circular sawtooth gratings using focused UV lithography
International Nuclear Information System (INIS)
Mi, Wujun; Karlsson, Staffan; Danielsson, Mats; Nillius, Peter; Holmberg, Anders
2016-01-01
This paper presents a novel micro-fabrication method using focused ultraviolet (UV) light to manufacture three-dimensional sawtooth structures in ultra-thick negative photoresist to fabricate a novel multi-prism x-ray lens. The method uses a lens to shape the UV beam instead of the photomask conventionally used in UV lithography. Benefits of this method include the ability to manufacture sawtooth structures in free form, for example in circular shapes as well as arrays of these shapes, and in resist that is up to 76 μm thick. To verify the method, initially a simple simulation based on Fourier optics was done to predict the exposure energy distribution in the photoresist. Furthermore, circular sawtooth gratings were manufactured in a 76 μm SU-8 resist. The UV lens was fabricated using electron beam lithography and then used to expose the SU-8 with UV light. This paper details the complete developed process, including pre-exposure with an e-beam and cold development, which creates stable sawtooth structures. The measured profile was compared to the ideal sawtooth and the simulation. The main discrepancy was in the smallest feature size, the sawtooth tips, which were wider than the desired structures, as would be expected by simulation. (paper)
Functional polymers by two-photon 3D lithography
Energy Technology Data Exchange (ETDEWEB)
Infuehr, Robert [Institute of Materials Science and Technology, Vienna University of Technology, Favoritenstrasse 9-11, 1040 Vienna (Austria) and Institute of Applied Synthetic Chemistry, Vienna University of Technology, Karlsplatz 13, 1040 Vienna (Austria); Pucher, Niklas; Heller, Christian [Institute of Materials Science and Technology, Vienna University of Technology, Favoritenstrasse 9-11, 1040 Vienna (Austria); Institute of Applied Synthetic Chemistry, Vienna University of Technology, Karlsplatz 13, 1040 Vienna (Austria); Lichtenegger, Helga [Institute of Materials Science and Technology, Vienna University of Technology, Favoritenstrasse 9-11, 1040 Vienna (Austria); Liska, Robert [Institute of Applied Synthetic Chemistry, Vienna University of Technology, Karlsplatz 13, 1040 Vienna (Austria); Schmidt, Volker; Kuna, Ladislav; Haase, Anja [Institute of Nanostructured Materials and Photonics, Joanneum Research, Franz-Pichler-Strasse 30, 8160 Weiz (Austria); Stampfl, Juergen [Institute of Materials Science and Technology, Vienna University of Technology, Favoritenstrasse 9-11, 1040 Vienna (Austria)
2007-12-15
In the presented work, two-photon 3D lithography and selective single-photon photopolymerization in a prefabricated polydimethylsiloxane matrix is presented as an approach with potential applicability of waveguide writing in 3D by two-photon polymerization. Photopolymers based on acrylate chemistry were used in order to evaluate the optical capabilities of the available two-photon system. Several photoinitiators, tailored for two-photon absorption, were tested in a mixture of trimethylolpropane triacrylate and ethoxylated trimethylolpropane triacrylate. Best results were obtained with a recently synthesized diynone-based photoinitiator. Feature resolutions in the range of 300 nm were achieved. Due to the cross-conjugated nature of that donor-{pi}-acceptor-{pi}-donor system a high two-photon absorption activity was achieved. Therefore, a resin mixture containing only 0.025 wt% of photoinitiator was practical for structuring by two-photon polymerization. The required initiator content was therefore a factor of 100 lower than in traditional one-photon lithography. The aim of the second part of this work was to fabricate optical waveguides by selectively irradiating a polymer network, which was swollen by a monomer. The monomer was polymerized by conventional single-photon polymerization and the uncured monomer was removed by evaporation at elevated temperatures. This treatment leads to a local change in refractive index. Refractive index changes in the range of {delta}n = 0.01 ({delta}n/n = 0.7%) were achieved, which is sufficient for structuring waveguides for optoelectronic applications.
Scalable, high performance, enzymatic cathodes based on nanoimprint lithography
Directory of Open Access Journals (Sweden)
Dmitry Pankratov
2015-06-01
Full Text Available Here we detail high performance, enzymatic electrodes for oxygen bio-electroreduction, which can be easily and reproducibly fabricated with industry-scale throughput. Planar and nanostructured electrodes were built on biocompatible, flexible polymer sheets, while nanoimprint lithography was used for electrode nanostructuring. To the best of our knowledge, this is one of the first reports concerning the usage of nanoimprint lithography for amperometric bioelectronic devices. The enzyme (Myrothecium verrucaria bilirubin oxidase was immobilised on planar (control and artificially nanostructured, gold electrodes by direct physical adsorption. The detailed electrochemical investigation of bioelectrodes was performed and the following parameters were obtained: open circuit voltage of approximately 0.75 V, and maximum bio-electrocatalytic current densities of 18 µA/cm2 and 58 µA/cm2 in air-saturated buffers versus 48 µA/cm2 and 186 µA/cm2 in oxygen-saturated buffers for planar and nanostructured electrodes, respectively. The half-deactivation times of planar and nanostructured biocathodes were measured to be 2 h and 14 h, respectively. The comparison of standard heterogeneous and bio-electrocatalytic rate constants showed that the improved bio-electrocatalytic performance of the nanostructured biocathodes compared to planar biodevices is due to the increased surface area of the nanostructured electrodes, whereas their improved operational stability is attributed to stabilisation of the enzyme inside nanocavities.
Metallic colour filtering arrays manufactured by nanoimprint lithography
Landis, S.; Brianceau, P.; Chaix, N.; Désières, Y.; Reboud, V.; Argoud, M.
2012-06-01
Colour filters using two-dimensional sub wavelength double-breasted rectangular hole, with a 250 nm period, were proposed and manufactured. Using low-cost, wafer scale thermal NanoImprint lithography, a thin metallic aluminium silicon alloy layer was patterned into two dimensional structures onto 200 mm wafer size. Process flow proposed in this paper is fully compatible with IC manufacturing line. A fine tuning of the manufactured design was proposed with arm widths ranging from 30 nm up to 60 nm, and arm lengths ranging from 100 nm up to 240 nm, keeping the period constant at 250 nm. Sub 20 nm resolution 200 mm silicon stamp, with aspect ratio larger than 5 were manufactured using electron beam lithography with proximity correction exposure strategy based on shape modification of the initial design. At the end 864 different patterns were manufactured and etched in thin 40 nm thick aluminium layer. The sub 30 nm resolution metallic patterns were then transfer from silicon wafer to transparent glass wafer to perform optical characterizations. Morphological characterizations and optical measurements of transmission spectra revealed that the optical response were very sensitive to the fine shape of the patterns etched in the metallic layer.
Fabrication and testing of optics for EUV projection lithography
Energy Technology Data Exchange (ETDEWEB)
Taylor, J. S., LLNL
1998-03-18
EUV Lithography (EUVL) is a leading candidate as a stepper technology for fabricating the ``0.1 {micro}m generation`` of microelectronic circuits. EUVL is an optical printing technique qualitatively similar to DUV Lithography (DUVL), except that 11-13nm wavelength light is used instead of 193-248nm. The feasibility of creating 0.1{micro}m features has been well-established using small-field EUVL printing tools and development efforts are currently underway to demonstrate that cost-effective production equipment can be engineered to perform full-width ring-field imaging consistent with high wafer throughput rates Ensuring that an industrial supplier base will be available for key components and subsystems is crucial to the success of EUVL. In particular, the projection optics are the heart of the EUVL imaging system, yet they have figure and finish specifications that are beyond the state-of-the-art in optics manufacturing. Thus it is important to demonstrate that industry will be able to fabricate and certify these optics commensurate with EUVL requirements. Indeed, the goal of this paper is to demonstrate that procuring EUVL projection optical substrates is feasible. This conclusion is based on measurements of both commercially-available and developmental substrates. The paper discusses EUVL figure and finish specifications, followed by examples of ultrasmooth and accurate surfaces, and concludes with a discussion of how substrates are measured and evaluated.
Achieving pattern uniformity in plasmonic lithography by spatial frequency selection
Liang, Gaofeng; Chen, Xi; Zhao, Qing; Guo, L. Jay
2018-01-01
The effects of the surface roughness of thin films and defects on photomasks are investigated in two representative plasmonic lithography systems: thin silver film-based superlens and multilayer-based hyperbolic metamaterial (HMM). Superlens can replicate arbitrary patterns because of its broad evanescent wave passband, which also makes it inherently vulnerable to the roughness of the thin film and imperfections of the mask. On the other hand, the HMM system has spatial frequency filtering characteristics and its pattern formation is based on interference, producing uniform and stable periodic patterns. In this work, we show that the HMM system is more immune to such imperfections due to its function of spatial frequency selection. The analyses are further verified by an interference lithography system incorporating the photoresist layer as an optical waveguide to improve the aspect ratio of the pattern. It is concluded that a system capable of spatial frequency selection is a powerful method to produce deep-subwavelength periodic patterns with high degree of uniformity and fidelity.
Mask Materials and Designs for Extreme Ultra Violet Lithography
Kim, Jung Sik; Ahn, Jinho
2018-03-01
Extreme ultra violet lithography (EUVL) is no longer a future technology but is going to be inserted into mass production of semiconductor devices of 7 nm technology node in 2018. EUVL is an extension of optical lithography using extremely short wavelength (13.5 nm). This short wavelength requires major modifications in the optical systems due to the very strong absorption of EUV light by materials. Refractive optics can no longer be used, and reflective optics is the only solution to transfer image from mask to wafer. This is why we need the multilayer (ML) mirror-based mask as well as an oblique incident angle of light. This paper discusses the principal theory on the EUV mask design and its component materials including ML reflector and EUV absorber. Mask shadowing effect (or mask 3D effect) is explained and its technical solutions like phase shift mask is reviewed. Even though not all the technical issues on EUV mask are handled in this review paper, you will be able to understand the principles determining the performance of EUV masks.
Fabrication of nanochannels on polyimide films using dynamic plowing lithography
Stoica, Iuliana; Barzic, Andreea Irina; Hulubei, Camelia
2017-12-01
Three distinct polyimide films were analyzed from the point of view of their morphology in order to determine if their surface features can be adapted for applications where surface anisotropy is mandatory. Channels of nanometric dimensions were created on surface of the specimens by using a less common atomic force microscopy (AFM) method, namely Dynamic Plowing Lithography (DPL). The changes generated by DPL procedure were monitored through the surface texture and other functional parameters, denoting the surface orientation degree and also bearing and fluid retention properties. The results revealed that in the same nanolithography conditions, the diamine and dianhydride moieties have affected the characteristics of the nanochannels. This was explained based on the aliphatic/aromatic nature of the monomers and the backbone flexibility. The reported data are of great importance in designing custom nanostructures with enhanced anisotropy on surface of polyimide films for liquid crystal orientation or guided cell growth purposes. At the end, to track the effect of the nanolithography process on the tip sharpness, degradation and contamination, the blind tip reconstruction was performed on AFM probe, before and after lithography experiments, using TGT1 test grating AFM image.
Fabrication of biomimetic dry-adhesion structures through nanosphere lithography
Kuo, P. C.; Chang, N. W.; Suen, Y.; Yang, S. Y.
2018-03-01
Components with surface nanostructures suitable for biomimetic dry adhesion have a great potential in applications such as gecko tape, climbing robots, and skin patches. In this study, a nanosphere lithography technique with self-assembly nanospheres was developed to achieve effective and efficient fabrication of dry-adhesion structures. Self-assembled monolayer nanospheres with high regularity were obtained through tilted dip-coating. Reactive-ion etching of the self-assembled nanospheres was used to fabricate nanostructures of different shapes and aspect ratios by varying the etching time. Thereafter, nickel molds with inverse nanostructures were replicated using the electroforming process. Polydimethylsiloxane (PDMS) nanostructures were fabricated through a gas-assisted hot-embossing method. The pulling test was performed to measure the shear adhesion on the glass substrate of a sample, and the static contact angle was measured to verify the hydrophobic property of the structure. The enhancement of the structure indicates that the adhesion force increased from 1.2 to 4.05 N/cm2 and the contact angle increased from 118.6° to 135.2°. This columnar structure can effectively enhance the adhesion ability of PDMS, demonstrating the potential of using nanosphere lithography for the fabrication of adhesive structures.
Large area nanoimprint by substrate conformal imprint lithography (SCIL)
Verschuuren, Marc A.; Megens, Mischa; Ni, Yongfeng; van Sprang, Hans; Polman, Albert
2017-06-01
Releasing the potential of advanced material properties by controlled structuring materials on sub-100-nm length scales for applications such as integrated circuits, nano-photonics, (bio-)sensors, lasers, optical security, etc. requires new technology to fabricate nano-patterns on large areas (from cm2 to 200 mm up to display sizes) in a cost-effective manner. Conventional high-end optical lithography such as stepper/scanners is highly capital intensive and not flexible towards substrate types. Nanoimprint has had the potential for over 20 years to bring a cost-effective, flexible method for large area nano-patterning. Over the last 3-4 years, nanoimprint has made great progress towards volume production. The main accelerator has been the switch from rigid- to wafer-scale soft stamps and tool improvements for step and repeat patterning. In this paper, we discuss substrate conformal imprint lithography (SCIL), which combines nanometer resolution, low patterns distortion, and overlay alignment, traditionally reserved for rigid stamps, with the flexibility and robustness of soft stamps. This was made possible by a combination of a new soft stamp material, an inorganic resist, combined with an innovative imprint method. Finally, a volume production solution will be presented, which can pattern up to 60 wafers per hour.
Integration of plant viruses in electron beam lithography nanostructures
International Nuclear Information System (INIS)
Alonso, Jose M; Bittner, Alexander M; Ondarçuhu, Thierry
2013-01-01
Tobacco mosaic virus (TMV) is the textbook example of a virus, and also of a self-assembling nanoscale structure. This tubular RNA/protein architecture has also found applications as biotemplate for the synthesis of nanomaterials such as wires, as tubes, or as nanoparticle assemblies. Although TMV is, being a biological structure, quite resilient to environmental conditions (temperature, chemicals), it cannot be processed in electron beam lithography (eBL) fabrication, which is the most important and most versatile method of nanoscale structuring. Here we present adjusted eBL-compatible processes that allow the incorporation of TMV in nanostructures made of positive and negative tone eBL resists. The key steps are covering TMV by polymer resists, which are only heated to 50 °C, and development (selective dissolution) in carefully selected organic solvents. We demonstrate the post-lithography biochemical functionality of TMV by selective immunocoating of the viral particles, and the use of immobilized TMV as direct immunosensor. Our modified eBL process should be applicable to incorporate a wide range of sensitive materials in nanofabrication schemes. (paper)
Action-angle variables and a KAM theorem for b-Poisson manifolds
Kiesenhofer, Anna; Miranda Galcerán, Eva; Scott, Geoffrey
2015-01-01
In this article we prove an action-angle theorem for b-integrable systems on b-Poisson manifolds improving the action-angle theorem contained in [14] for general Poisson manifolds in this setting. As an application, we prove a KAM-type theorem for b-Poisson manifolds. (C) 2015 Elsevier Masson SAS. All rights reserved.
A Raikov-Type Theorem for Radial Poisson Distributions: A Proof of Kingman's Conjecture
Van Nguyen, Thu
2011-01-01
In the present paper we prove the following conjecture in Kingman, J.F.C., Random walks with spherical symmetry, Acta Math.,109, (1963), 11-53. concerning a famous Raikov's theorem of decomposition of Poisson random variables: "If a radial sum of two independent random variables X and Y is radial Poisson, then each of them must be radial Poisson."
A comparison of Poisson-one-inflated power series distributions for ...
African Journals Online (AJOL)
A class of Poisson-one-inflated power series distributions (the binomial, the Poisson, the negative binomial, the geometric, the log-series and the misrecorded Poisson) are proposed for modeling rural out-migration at the household level. The probability mass functions of the mixture distributions are derived and fitted to the ...
Laser based spot weld characterization
Jonietz, Florian; Myrach, Philipp; Rethmeier, Michael; Suwala, Hubert; Ziegler, Mathias
2016-02-01
Spot welding is one of the most important joining technologies, especially in the automotive industry. Hitherto, the quality of spot welded joints is tested mainly by random destructive tests. A nondestructive testing technique offers the benefit of cost reduction of the testing procedure and optimization of the fabrication process, because every joint could be examined. This would lead to a reduced number of spot welded joints, as redundancies could be avoided. In the procedure described here, the spot welded joint between two zinc-coated steel sheets (HX340LAD+Z100MB or HC340LA+ZE 50/50) is heated optically on one side. Laser radiation and flash light are used as heat sources. The melted zone, the so called "weld nugget" provides the mechanical stability of the connection, but also constitutes a thermal bridge between the sheets. Due to the better thermal contact, the spot welded joint reveals a thermal behavior different from the surrounding material, where the heat transfer between the two sheets is much lower. The difference in the transient thermal behavior is measured with time resolved thermography. Hence, the size of the thermal contact between the two sheets is determined, which is directly correlated to the size of the weld nugget, indicating the quality of the spot weld. The method performs well in transmission with laser radiation and flash light. With laser radiation, it works even in reflection geometry, thus offering the possibility of testing with just one-sided accessibility. By using heating with collimated laser radiation, not only contact-free, but also remote testing is feasible. A further convenience compared to similar thermographic approaches is the applicability on bare steel sheets without any optical coating for emissivity correction. For this purpose, a proper way of emissivity correction was established.
Is this Red Spot the Blue Spot (locus ceruleum)?
Energy Technology Data Exchange (ETDEWEB)
Choe, Won Sick; Lee, Yu Kyung; Lee, Min Kyung; Hwang, Kyung Hoon [Gachon University Gil Hospital, Incheon (Korea, Republic of)
2010-06-15
The authors report brain images of 18F-FDG-PET in a case of schizophrenia. The images showed strikingly increased bilateral uptake in the locus ceruleum. The locus ceruleum is called the blue spot and known to be a center of the norepinephrinergic system.
Bases chimiosensorielles du comportement alimentaire chez les poissons
Directory of Open Access Journals (Sweden)
SAGLIO Ph.
1981-07-01
Full Text Available Le comportement alimentaire, indispensable à la survie de l'individu et donc de l'espèce, occupe à ce titre une position de première importance dans la hiérarchie des comportements fondamentaux qui tous en dépendent très étroitement. Chez les poissons, cette prééminence se trouve illustrée par l'extrême diversité des supports sensoriels impliqués et des expressions comportementales qui leur sont liées. A la suite d'un certain nombre de mises en évidence neurophysiologiques et éthologiques de l'importance du sens chimique (olfaction, gustation dans le comportement alimentaire des poissons, de très importants secteurs d'études électrophysiologiques et d'analyses physico-chimiques visant à en déterminer la nature exacte (en termes de substances actives se sont développés ces vingt dernières années. De tous ces travaux dont les plus avancés sont présentés ici, il ressort que les acides aminés de série L plus ou moins associés à d'autres composés de poids moléculaires < 1000 constituent des composés chimiques jouant un rôle déterminant dans le comportement alimentaire de nombreuses espèces de poissons carnivores.
Comment on: 'A Poisson resampling method for simulating reduced counts in nuclear medicine images'
DEFF Research Database (Denmark)
de Nijs, Robin
2015-01-01
by a direct numerical simulation in Matlab. Not only Poisson resampling, but also two direct redrawing methods were investigated. Redrawing methods were based on a Poisson and a Gaussian distribution. Mean, standard deviation, skewness and excess kurtosis half-count/full-count ratios were determined for all...... methods, and compared to the theoretical values for a Poisson distribution. Statistical parameters showed the same behavior as in the original note and showed the superiority of the Poisson resampling method. Rounding off before saving of the half count image had a severe impact on counting statistics...... for counts below 100. Only Poisson resampling was not affected by this, while Gaussian redrawing was less affected by it than Poisson redrawing. Poisson resampling is the method of choice, when simulating half-count (or less) images from full-count images. It simulates correctly the statistical properties...
On population size estimators in the Poisson mixture model.
Mao, Chang Xuan; Yang, Nan; Zhong, Jinhua
2013-09-01
Estimating population sizes via capture-recapture experiments has enormous applications. The Poisson mixture model can be adopted for those applications with a single list in which individuals appear one or more times. We compare several nonparametric estimators, including the Chao estimator, the Zelterman estimator, two jackknife estimators and the bootstrap estimator. The target parameter of the Chao estimator is a lower bound of the population size. Those of the other four estimators are not lower bounds, and they may produce lower confidence limits for the population size with poor coverage probabilities. A simulation study is reported and two examples are investigated. © 2013, The International Biometric Society.
Team behaviour analysis in sports using the poisson equation
Direkoglu, Cem; O'Connor, Noel E.
2012-01-01
We propose a novel physics-based model for analysing team play- ers’ positions and movements on a sports playing field. The goal is to detect for each frame the region with the highest population of a given team’s players and the region towards which the team is moving as they press for territorial advancement, termed the region of intent. Given the positions of team players from a plan view of the playing field at any given time, we solve a particular Poisson equation to generate a smooth di...
An approach to numerically solving the Poisson equation
Feng, Zhichen; Sheng, Zheng-Mao
2015-06-01
We introduce an approach for numerically solving the Poisson equation by using a physical model, which is a way to solve a partial differential equation without the finite difference method. This method is especially useful for obtaining the solutions in very many free-charge neutral systems with open boundary conditions. It can be used for arbitrary geometry and mesh style and is more efficient comparing with the widely-used iterative algorithm with multigrid methods. It is especially suitable for parallel computing. This method can also be applied to numerically solving other partial differential equations whose Green functions exist in analytic expression.
Large Time Behavior of the Vlasov-Poisson-Boltzmann System
Directory of Open Access Journals (Sweden)
Li Li
2013-01-01
Full Text Available The motion of dilute charged particles can be modeled by Vlasov-Poisson-Boltzmann system. We study the large time stability of the VPB system. To be precise, we prove that when time goes to infinity, the solution of VPB system tends to global Maxwellian state in a rate Ot−∞, by using a method developed for Boltzmann equation without force in the work of Desvillettes and Villani (2005. The improvement of the present paper is the removal of condition on parameter λ as in the work of Li (2008.
Localization of Point Sources for Poisson Equation using State Observers
Majeed, Muhammad Usman
2016-08-09
A method based On iterative observer design is presented to solve point source localization problem for Poisson equation with riven boundary data. The procedure involves solution of multiple boundary estimation sub problems using the available Dirichlet and Neumann data from different parts of the boundary. A weighted sum of these solution profiles of sub-problems localizes point sources inside the domain. Method to compute these weights is also provided. Numerical results are presented using finite differences in a rectangular domain. (C) 2016, IFAC (International Federation of Automatic Control) Hosting by Elsevier Ltd. All rights reserved.
Supersymmetric quantum corrections and Poisson-Lie T-duality
International Nuclear Information System (INIS)
Assaoui, F.; Lhallabi, T.; Abdus Salam International Centre for Theoretical Physics, Trieste
2000-07-01
The quantum actions of the (4,4) supersymmetric non-linear sigma model and its dual in the Abelian case are constructed by using the background superfield method. The propagators of the quantum superfield and its dual and the gauge fixing actions of the original and dual (4,4) supersymmetric sigma models are determined. On the other hand, the BRST transformations are used to obtain the quantum dual action of the (4,4) supersymmetric nonlinear sigma model in the sense of Poisson-Lie T-duality. (author)
Ruin probabilities for a regenerative Poisson gap generated risk process
DEFF Research Database (Denmark)
Asmussen, Søren; Biard, Romain
. Asymptotic expressions for the inﬁnite horizon ruin probabilities are given both for the light- and the heavy-tailed case. A basic observation is that the process regenerates at each G-claim. Also an approach via Markov additive processes is outlined, and heuristics are given for the distribution of the time......A risk process with constant premium rate c and Poisson arrivals of claims is considered. A threshold r is deﬁned for claim interarrival times, such that if k consecutive interarrival times are larger than r, then the next claim has distribution G. Otherwise, the claim size distribution is F...
Improving EWMA Plans for Detecting Unusual Increases in Poisson Counts
Directory of Open Access Journals (Sweden)
R. S. Sparks
2009-01-01
adaptive exponentially weighted moving average (EWMA plan is developed for signalling unusually high incidence when monitoring a time series of nonhomogeneous daily disease counts. A Poisson transitional regression model is used to fit background/expected trend in counts and provides “one-day-ahead” forecasts of the next day's count. Departures of counts from their forecasts are monitored. The paper outlines an approach for improving early outbreak data signals by dynamically adjusting the exponential weights to be efficient at signalling local persistent high side changes. We emphasise outbreak signals in steady-state situations; that is, changes that occur after the EWMA statistic had run through several in-control counts.
Standard Test Method for Determining Poisson's Ratio of Honeycomb Cores
American Society for Testing and Materials. Philadelphia
2002-01-01
1.1 This test method covers the determination of the honeycomb Poisson's ratio from the anticlastic curvature radii, see . 1.2 The values stated in SI units are to be regarded as the standard. The inch-pound units given may be approximate. This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
Maslov indices, Poisson brackets, and singular differential forms
Esterlis, I.; Haggard, H. M.; Hedeman, A.; Littlejohn, R. G.
2014-06-01
Maslov indices are integers that appear in semiclassical wave functions and quantization conditions. They are often notoriously difficult to compute. We present methods of computing the Maslov index that rely only on typically elementary Poisson brackets and simple linear algebra. We also present a singular differential form, whose integral along a curve gives the Maslov index of that curve. The form is closed but not exact, and transforms by an exact differential under canonical transformations. We illustrate the method with the 6j-symbol, which is important in angular-momentum theory and in quantum gravity.
Gap processing for adaptive maximal poisson-disk sampling
Yan, Dongming
2013-10-17
In this article, we study the generation of maximal Poisson-disk sets with varying radii. First, we present a geometric analysis of gaps in such disk sets. This analysis is the basis for maximal and adaptive sampling in Euclidean space and on manifolds. Second, we propose efficient algorithms and data structures to detect gaps and update gaps when disks are inserted, deleted, moved, or when their radii are changed.We build on the concepts of regular triangulations and the power diagram. Third, we show how our analysis contributes to the state-of-the-art in surface remeshing. © 2013 ACM.
Critical illumination condenser for x-ray lithography
Cohen, S.J.; Seppala, L.G.
1998-04-07
A critical illumination condenser system is disclosed, particularly adapted for use in extreme ultraviolet (EUV) projection lithography based on a ring field imaging system and a laser produced plasma source. The system uses three spherical mirrors and is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. The angles of radiation incident upon each mirror of the critical illumination condenser vary by less than eight (8) degrees. For example, the imaging system in which the critical illumination condenser is utilized has a 200 {micro}m source and requires a magnification of 26. The three spherical mirror system constitutes a two mirror inverse Cassegrain, or Schwarzschild configuration, with a 25% area obstruction (50% linear obstruction). The third mirror provides the final pupil and image relay. The mirrors include a multilayer reflective coating which is reflective over a narrow bandwidth. 6 figs.
On the integration of memristors with CMOS using nanoimprint lithography
Xia, Qiangfei; Tong, W. M.; Wu, W.; Yang, J. J.; Li, X.; Robinett, W.; Cardinali, T.; Cumbie, M.; Ellenson, J. E.; Kuekes, P.; Williams, R. S.
2009-03-01
Memristors were vertically integrated with CMOS circuits using nanoimprint lithography (NIL), making a transistor/memeristor hybrid circuit. Several planarization technologies were developed for the CMOS substrates to meet the surface planarity requirement for NIL. Accordingly, different integration schemes were developed and optimized. UV-curable NIL (UV-NIL) using a double layer spin-on resists was carried out to pattern the electrodes for memristors. This is the first demonstration of NIL on active CMOS substrates that are fabricated in a CMOS fab. Our work demonstrates that NIL is compatible with commercial IC fabrication process. It was also demonstrated that the memristors are integratable with traditional CMOS to make hybrid circuits without changing the current infrastructure in IC industry.
Nanoparticles with tunable shape and composition fabricated by nanoimprint lithography
International Nuclear Information System (INIS)
Alayo, Nerea; Bausells, Joan; Pérez-Murano, Francesc; Conde-Rubio, Ana; Labarta, Amilcar; Batlle, Xavier; Borrisé, Xavier
2015-01-01
Cone-like and empty cup-shaped nanoparticles of noble metals have been demonstrated to provide extraordinary optical properties for use as optical nanoanntenas or nanoresonators. However, their large-scale production is difficult via standard nanofabrication methods. We present a fabrication approach to achieve arrays of nanoparticles with tunable shape and composition by a combination of nanoimprint lithography, hard-mask definition and various forms of metal deposition. In particular, we have obtained arrays of empty cup-shaped Au nanoparticles showing an optical response with distinguishable features associated with the excitations of localized surface plasmons. Finally, this route avoids the most common drawbacks found in the fabrication of nanoparticles by conventional top-down methods, such as aspect ratio limitation, blurring, and low throughput, and it can be used to fabricate nanoparticles with heterogeneous composition. (paper)
Batch fabrication of nanopatterned graphene devices via nanoimprint lithography
Mackenzie, David M. A.; Smistrup, Kristian; Whelan, Patrick R.; Luo, Birong; Shivayogimath, Abhay; Nielsen, Theodor; Petersen, Dirch H.; Messina, Sara A.; Bøggild, Peter
2017-11-01
Previous attempts to tune the electrical properties of large-scale graphene via nanopatterning have led to serious degradation of the key electrical parameters that make graphene a desirable material for electronic devices. We use thermal nanoimprint lithography to pattern wafer-scale graphene on a 4-in. wafer with prefabricated 25 mm2 devices. The nanopatterning process introduces a modest decrease in carrier mobility and only a minor change in residual doping. Due to the rapid fabrication time of approximately 90 min per wafer, this method has potential for large-scale industrial production. The chemiresistive gas sensing response towards NO2 was assessed in humid synthetic air and dry air, with devices showing a response to 50 ppb of NO2 only when nanopatterned.
Method for the protection of extreme ultraviolet lithography optics
Grunow, Philip A.; Clift, Wayne M.; Klebanoff, Leonard E.
2010-06-22
A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.
Inclined nanoimprinting lithography-based 3D nanofabrication
Liu, Zhan; Bucknall, David G.; Allen, Mark G.
2011-06-01
We report a 'top-down' 3D nanofabrication approach combining non-conventional inclined nanoimprint lithography (INIL) with reactive ion etching (RIE), contact molding and 3D metal nanotransfer printing (nTP). This integration of processes enables the production and conformal transfer of 3D polymer nanostructures of varying heights to a variety of other materials including a silicon-based substrate, a silicone stamp and a metal gold (Au) thin film. The process demonstrates the potential of reduced fabrication cost and complexity compared to existing methods. Various 3D nanostructures in technologically useful materials have been fabricated, including symmetric and asymmetric nanolines, nanocircles and nanosquares. Such 3D nanostructures have potential applications such as angle-resolved photonic crystals, plasmonic crystals and biomimicking anisotropic surfaces. This integrated INIL-based strategy shows great promise for 3D nanofabrication in the fields of photonics, plasmonics and surface tribology.
High speed hydraulic scanner for deep x-ray lithography
International Nuclear Information System (INIS)
Milne, J.C.; Johnson, E.D.
1997-07-01
From their research and development in hard x-ray lithography, the authors have found that the conventional leadscrew driven scanner stages do not provide adequate scan speed or travel. These considerations have led the authors to develop a scanning system based on a long stroke hydraulic drive with 635 mm of travel and closed loop feedback to position the stage to better than 100 micrometers. The control of the device is through a PC with a custom LabView interface coupled to simple x-ray beam diagnostics. This configuration allows one to set a variety of scan parameters, including target dose, scan range, scan rates, and dose rate. Results from the prototype system at beamline X-27B are described as well as progress on a production version for the X-14B beamline
Polymer-based optical interconnects using nanoimprint lithography
Boersma, Arjen; Wiegersma, Sjoukje; Offrein, Bert J.; Duis, Jeroen; Delis, Jos; Ortsiefer, Markus; van Steenberge, Geert; Karpinen, Mikko; van Blaaderen, Alfons; Corbett, Brian
2013-02-01
The increasing request for higher data speeds in the information and communication technology leads to continuously increasing performance of microprocessors. This has led to the introduction of optical data transmission as a replacement of electronic data transmission in most transmission applications longer than 10 meters. However, a need remains for optical data transmission for shorter distances inside the computer. This paper gives an overview of the Joint European project FIREFLY, in which new polymer based single mode waveguides are developed for integration with VCSELs, splitters and fibers that will be manufactured using multi-layer nanoimprint lithography (NIL). Innovative polymers, new applications of nano-technology, new methods for optical coupling between components, and the integration of all these new components are the technical ingredients of this ambitious project.
Lithography cycle time improvements using short-interval scheduling
Norman, David; Watson, Scott; Anderson, Michael; Marteney, Steve; Mehr, Ben
2010-04-01
Partially and fully automated semiconductor manufacturing facilities around the world have employed automated real-time dispatchers (RTD) as a critical element of their factory management solutions. The success of RTD is attributable to a detailed and extremely accurate data base that reflects the current state of the factory, consistently applied dispatching policies and continuous improvement of these dispatching policies. However, many manufactures are now reaching the benefit limits of pure dispatching-based or other "heuristic-only" solutions. A new solution is needed that combines locally optimized short-interval schedules with RTD policies to target further reductions in product cycle time. This paper describes an integrated solution that employs four key components: 1. real-time data generation, 2. simulation-based prediction, 3. locally optimized short-interval scheduling, and 4. schedule-aware real-time dispatching. The authors describe how this solution was deployed in lithography and wet / diffusion areas, and report the resulting improvements measured.
Vitreous carbon mask substrate for X-ray lithography
Aigeldinger, Georg [Livermore, CA; Skala, Dawn M [Fremont, CA; Griffiths, Stewart K [Livermore, CA; Talin, Albert Alec [Livermore, CA; Losey, Matthew W [Livermore, CA; Yang, Chu-Yeu Peter [Dublin, CA
2009-10-27
The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask absorber used to pattern the resist, and this enables improved mask accuracy. An alternative embodiment comprised the use of vitreous carbon as a LIGA substrate wherein the VC wafer blank is etched in a reactive ion plasma after which an X-ray resist is bonded. This surface treatment provides a surface enabling good adhesion of the X-ray photoresist and subsequent nucleation and adhesion of the electrodeposited metal for LIGA mold-making while the VC substrate practically eliminates secondary radiation effects that lead to delamination of the X-ray resist form the substrate, the loss of isolated resist features, and the formation of a resist layer adjacent to the substrate that is insoluble in the developer.
Graphene nano-objects tailored by interference lithography
Kazemi, Alireza; He, Xiang; Ghasemi, Javad; Alaie, Seyed H.; Dawson, Noel M.; Klein, Brianna; Kiesow, Karissa; Wozniak, Douglas; Habteyes, Terefe; Brueck, Steven R. J.; Krishna, Sanjay
2014-09-01
We propose a facile approach to fabricate graphene nano-objects (GNOs) using interference lithography (IL) and direct self-assembly of nanoparticles. Uniformly spaced parallel photoresist (PR) lines and periodic hole arrays are proposed as an etch mask for producing graphene nanoribbons (GNRs), and graphene nanomesh (GNM), respectively. In a different experiment, the PR line arrays are transferred to uniform oxide channels, and silica nanoparticle dispersions with an average size of 10 nm are spun on the patterned surface, leaving a monolayer uniform nanoparticle assembly on the graphene. Following the particle deposition, the graphene is removed in the narrow spacing between the particles, using the O2 plasma etch, leaving ordered graphene quantum dot (GQD) arrays. The IL technique and etch process enables tuning the GNOs dimensions.
A 3D-printed device for polymer nanoimprint lithography
Caño-García, Manuel; Geday, Morten A.; Gil-Valverde, Manuel; Megías Zarco, Antonio; Otón, José M.; Quintana, Xabier
2018-02-01
Nanoimprint lithography (NIL) is an imprinting technique which has experienced an increasing popularity due to its versatility in fabrication processes. Commercial NIL machines are readily available achieving high quality results; however, these machines involve a relatively high investment. Hence, small laboratories often choose to perform NIL copies in a more rudimentary and cheaper way. A new simple system is presented in this document. It is based on two devices which can be made in-house in plastic by using a 3D printer or in aluminum. Thus, the overall manufacturing complexity is vastly reduced. The presented system includes pressure control and potentially temperature control. Replicas have been made using a sawtooth grating master with a pitch around half micrometre. High quality patterns with low density of imperfections have been achieved in 2.25 cm2 surfaces. The material chosen for the negative intermediary mould is PDMS. Tests of the imprint have been performed using the commercial hybrid polymer Ormostamp®.
Nanoimprint Lithography on curved surfaces prepared by fused deposition modelling
International Nuclear Information System (INIS)
Köpplmayr, Thomas; Häusler, Lukas; Bergmair, Iris; Mühlberger, Michael
2015-01-01
Fused deposition modelling (FDM) is an additive manufacturing technology commonly used for modelling, prototyping and production applications. The achievable surface roughness is one of its most limiting aspects. It is however of great interest to create well-defined (nanosized) patterns on the surface for functional applications such as optical effects, electronics or bio-medical devices. We used UV-curable polymers of different viscosities and flexible stamps made of poly(dimethylsiloxane) (PDMS) to perform Nanoimprint Lithography (NIL) on FDM-printed curved parts. Substrates with different roughness and curvature were prepared using a commercially available 3D printer. The nanoimprint results were characterized by optical light microscopy, profilometry and atomic force microscopy (AFM). Our experiments show promising results in creating well-defined microstructures on the 3D-printed parts. (paper)
Uniformity across 200 mm silicon wafers printed by nanoimprint lithography
International Nuclear Information System (INIS)
Gourgon, C; Perret, C; Tallal, J; Lazzarino, F; Landis, S; Joubert, O; Pelzer, R
2005-01-01
Uniformity of the printing process is one of the key parameters of nanoimprint lithography. This technique has to be extended to large size wafers to be useful for several industrial applications, and the uniformity of micro and nanostructures has to be guaranteed on large surfaces. This paper presents results of printing on 200 mm diameter wafers. The residual thickness uniformity after printing is demonstrated at the wafer scale in large patterns (100 μm), in smaller lines of 250 nm and in sub-100 nm features. We show that a mould deformation occurs during the printing process, and that this deformation is needed to guarantee printing uniformity. However, the mould deformation is also responsible for the potential degradation of the patterns
Colloidal lithography for fabricating patterned polymer-brush microstructures
Directory of Open Access Journals (Sweden)
Tao Chen
2012-05-01
Full Text Available We exploit a series of robust, but simple and convenient colloidal lithography (CL approaches, using a microsphere array as a mask or as a guiding template, and combine this with surface-initiated atom-transfer radical polymerization (SI-ATRP to fabricate patterned polymer-brush microstructures. The advantages of the CL technique over other lithographic approaches for the fabrication of patterned polymer brushes are (i that it can be carried out with commercially available colloidal particles at a relatively low cost, (ii that no complex equipment is required to create the patterned templates with micro- and nanoscale features, and (iii that polymer brush features are controlled simply by changing the size or chemical functionality of the microspheres or the substrate.
Micropump and venous valve by micro stereo lithography
Varadan, Vijay K.; Varadan, Vasundara V.
2000-06-01
Micro Stereo Lithography (MSL) is a poor man's LIGA for fabricating high aspect ratio MEMS devices in UV curable semiconducting polymers using either two computer-controlled low inertia galvanometric mirrors with the aid of focusing lens or an array of optical fibers. For 3D MEMS devices, the polymers need to have conductive and possibly piezoelectric or ferroelectric properties. Such polymers are being developed at Penn State resulting in microdevices for fluid and drug delivery. Applications may include implanted medical delivery system, artificial heart valves, chemical and biological instruments, fluid delivery in engines, pump coolants and refrigerants for local cooling of electronic components. With the invention of organic thin film transistor, now it is possible to fabricate 3D polymeric MEMS devices with built-in-electronics similar to silicon based microelectronics.
Novel organosilicone materials and patterning techniques for nanoimprint lithography
Pina, Carlos Alberto
Nanoimprint Lithography (NIL) is a high-throughput patterning technique that allows the fabrication of nanostructures with great precision. It has been listed on the International Technology Roadmap for Semiconductors (ITRS) as a candidate technology for future generation Si chip manufacturing. In nanoimprint Lithography a resist material, e.g. a thermoplastic polymer, is placed in contact with a mold and then mechanically deformed under an applied load to transfer the nano-features on the mold surface into the resist. The success of NIL relies heavily in the capability of fabricating nanostructures on different types of materials. Thus, a key factor for NIL implementation in industrial settings is the development of advanced materials suitable as the nanoimprint resist. This dissertation focuses on the engineering of new polymer materials suitable as NIL resist. A variety of silicone-based polymer precursors were synthesized and formulated for NIL applications. High throughput and high yield nanopatterning was successfully achieved. Furthermore, additional capabilities of the developed materials were explored for a range of NIL applications such as their use as flexible, UV-transparent stamps and silicon compatible etching layers. Finally, new strategies were investigated to expand the NIL potentiality. High throughput, non-residual layer imprinting was achieved with the newly developed resist materials. In addition, several strategies were designed for the precise control of nanoscale size patterned structures with multifunctional resist systems by post-imprinting modification of the pattern size. These developments provide NIL with a new set of tools for a variety of additional important applications.
Wafer based mask characterization for double patterning lithography
de Kruif, Robert; Bubke, Karsten; Janssen, Gert-Jan; van der Heijden, Eddy; Fochler, Jörg; Dusa, Mircea; Peters, Jan Hendrik; de Haas, Paul; Connolly, Brid
2008-04-01
Double Patterning Technology (DPT) is considered the most acceptable solution for 32nm node lithography. Apart from the obvious drawbacks of additional exposure and processing steps and therefore reduced throughput, DPT possesses a number of additional technical challenges. This relates to exposure tool capability, the actual applied process in the wafer fab but also to mask performance. This paper will focus on the latter. We will report on the performance of a two-reticle set based on a design developed to study the impact of mask global and local placement errors on a DPT dual line process. For 32 nm node lithography using DPT a reticle to reticle overlay contribution target of data resulting from the earlier mentioned reticle set. The reticles contain a 13x19 array of modules comprising various standard overlay features such as ASML overlay gratings and bar-in-bar overlay targets. Furthermore the modules contain split 40nm half pitch DPT features. The reticles have been exposed on an ASML XT:1700i on several wafers in multiple fields. Reticle to reticle overlay contribution has been studied in resist (double exposure) and using the IMEC dual line process (DPT). We will show that the reticle to reticle overlay contribution on the wafer is smaller than 1.5nm (1x). We will compare the wafer data with the reticle data, study the correlation and show that reticle to reticle overlay contribution based single mask registration measurements can be used to qualify the reticle to reticle overlay contribution on wafer.
Dressing percentage in Romanian spotted breed
Directory of Open Access Journals (Sweden)
eleonora nistor
2013-05-01
Full Text Available The purpose of this research was to determine whether there are significant differences in terms of carcass weight, forequarters, hindquarters and the dressing percentage among Romanian Spotted breed steers and first generation crossbreed obtained between Romanian Spotted and Holstein at slaughter age of 12 and 17 months respectively. Study was done on Romanian Spotted breed steer aged 12 months (36 heads and 17 months (19 heads; Romanian Spotted x Holstein first generation crossbreed of aged 12 months (29 heads and 17 months (20 heads. The Romanian Spotted breed steer, show superiority in terms of carcass weight compared to crossbreed of Romanian Spotted x Holstein, therefore this breed has a better suitability for fattening for meat. Regarding dressing percentage is higher in crossbreed of Romanian Spotted x Holstein compared with Romanian Spotted breed steers, but the difference is insignificant.
Dominant white spotting in the Chinese hamster.
Henwood, C; Henwood, J; Robinson, R
1987-01-01
An autosomal dominant white spotting mutant is described for the Chinese hamster. The mutant gene is designated as dominant spot (symbol Ds). The homozygote DsDs is a prenatal lethal while the heterozygote Ds + displays white spotting. The expression of white is variable, ranging from a white forehead spot to extensive white on the body. The venter is invariably white. Growth appears to be normal and the fertility of both sizes shows no impairment.
Laser Pyrometer For Spot Temperature Measurements
Elleman, D. D.; Allen, J. L.; Lee, M. C.
1988-01-01
Laser pyrometer makes temperature map by scanning measuring spot across target. Scanning laser pyrometer passively measures radiation emitted by scanned spot on target and calibrated by similar passive measurement on blackbody of known temperature. Laser beam turned on for active measurements of reflectances of target spot and reflectance standard. From measurements, temperature of target spot inferred. Pyrometer useful for non-contact measurement of temperature distributions in processing of materials.
Inexact Bregman iteration with an application to Poisson data reconstruction
Benfenati, A.; Ruggiero, V.
2013-06-01
This work deals with the solution of image restoration problems by an iterative regularization method based on the Bregman iteration. Any iteration of this scheme requires the exact computation of the minimizer of a function. However, in some image reconstruction applications, it is either impossible or extremely expensive to obtain exact solutions of these subproblems. In this paper, we propose an inexact version of the iterative procedure, where the inexactness in the inner subproblem solution is controlled by a criterion that preserves the convergence of the Bregman iteration and its features in image restoration problems. In particular, the method allows us to obtain accurate reconstructions also when only an overestimation of the regularization parameter is known. The introduction of the inexactness in the iterative scheme allows us to address image reconstruction problems from data corrupted by Poisson noise, exploiting the recent advances about specialized algorithms for the numerical minimization of the generalized Kullback-Leibler divergence combined with a regularization term. The results of several numerical experiments enable us to evaluate the proposed scheme for image deblurring or denoising in the presence of Poisson noise.
Sparsity-based Poisson denoising with dictionary learning.
Giryes, Raja; Elad, Michael
2014-12-01
The problem of Poisson denoising appears in various imaging applications, such as low-light photography, medical imaging, and microscopy. In cases of high SNR, several transformations exist so as to convert the Poisson noise into an additive-independent identically distributed. Gaussian noise, for which many effective algorithms are available. However, in a low-SNR regime, these transformations are significantly less accurate, and a strategy that relies directly on the true noise statistics is required. Salmon et al took this route, proposing a patch-based exponential image representation model based on Gaussian mixture model, leading to state-of-the-art results. In this paper, we propose to harness sparse-representation modeling to the image patches, adopting the same exponential idea. Our scheme uses a greedy pursuit with boot-strapping-based stopping condition and dictionary learning within the denoising process. The reconstruction performance of the proposed scheme is competitive with leading methods in high SNR and achieving state-of-the-art results in cases of low SNR.
A modified Poisson-Boltzmann equation applied to protein adsorption.
Gama, Marlon de Souza; Santos, Mirella Simões; Lima, Eduardo Rocha de Almeida; Tavares, Frederico Wanderley; Barreto, Amaro Gomes Barreto
2018-01-05
Ion-exchange chromatography has been widely used as a standard process in purification and analysis of protein, based on the electrostatic interaction between the protein and the stationary phase. Through the years, several approaches are used to improve the thermodynamic description of colloidal particle-surface interaction systems, however there are still a lot of gaps specifically when describing the behavior of protein adsorption. Here, we present an improved methodology for predicting the adsorption equilibrium constant by solving the modified Poisson-Boltzmann (PB) equation in bispherical coordinates. By including dispersion interactions between ions and protein, and between ions and surface, the modified PB equation used can describe the Hofmeister effects. We solve the modified Poisson-Boltzmann equation to calculate the protein-surface potential of mean force, treated as spherical colloid-plate system, as a function of process variables. From the potential of mean force, the Henry constants of adsorption, for different proteins and surfaces, are calculated as a function of pH, salt concentration, salt type, and temperature. The obtained Henry constants are compared with experimental data for several isotherms showing excellent agreement. We have also performed a sensitivity analysis to verify the behavior of different kind of salts and the Hofmeister effects. Copyright © 2017 Elsevier B.V. All rights reserved.
Polyelectrolyte Microcapsules: Ion Distributions from a Poisson-Boltzmann Model
Tang, Qiyun; Denton, Alan R.; Rozairo, Damith; Croll, Andrew B.
2014-03-01
Recent experiments have shown that polystyrene-polyacrylic-acid-polystyrene (PS-PAA-PS) triblock copolymers in a solvent mixture of water and toluene can self-assemble into spherical microcapsules. Suspended in water, the microcapsules have a toluene core surrounded by an elastomer triblock shell. The longer, hydrophilic PAA blocks remain near the outer surface of the shell, becoming charged through dissociation of OH functional groups in water, while the shorter, hydrophobic PS blocks form a networked (glass or gel) structure. Within a mean-field Poisson-Boltzmann theory, we model these polyelectrolyte microcapsules as spherical charged shells, assuming different dielectric constants inside and outside the capsule. By numerically solving the nonlinear Poisson-Boltzmann equation, we calculate the radial distribution of anions and cations and the osmotic pressure within the shell as a function of salt concentration. Our predictions, which can be tested by comparison with experiments, may guide the design of microcapsules for practical applications, such as drug delivery. This work was supported by the National Science Foundation under Grant No. DMR-1106331.
Prescription-induced jump distributions in multiplicative Poisson processes
Suweis, Samir; Porporato, Amilcare; Rinaldo, Andrea; Maritan, Amos
2011-06-01
Generalized Langevin equations (GLE) with multiplicative white Poisson noise pose the usual prescription dilemma leading to different evolution equations (master equations) for the probability distribution. Contrary to the case of multiplicative Gaussian white noise, the Stratonovich prescription does not correspond to the well-known midpoint (or any other intermediate) prescription. By introducing an inertial term in the GLE, we show that the Itô and Stratonovich prescriptions naturally arise depending on two time scales, one induced by the inertial term and the other determined by the jump event. We also show that, when the multiplicative noise is linear in the random variable, one prescription can be made equivalent to the other by a suitable transformation in the jump probability distribution. We apply these results to a recently proposed stochastic model describing the dynamics of primary soil salinization, in which the salt mass balance within the soil root zone requires the analysis of different prescriptions arising from the resulting stochastic differential equation forced by multiplicative white Poisson noise, the features of which are tailored to the characters of the daily precipitation. A method is finally suggested to infer the most appropriate prescription from the data.
Efficient DSA-DP hybrid lithography conflict detection and guiding template assignment
Ou, Jiaojiao; Cline, Brian; Yeric, Greg; Pan, David Z.
2017-03-01
In recent years, directed self-assembly (DSA) has demonstrated tremendous potential to reduce cost for multiple patterning with fewer masks, especially for via patterning. DSA is considered as one of the next generation lithography candidates or complementary lithography techniques to extend 193i lithography further for the sub- 7 nm nodes. In this work, we focus on the simultaneous DSA guiding template assignment and decomposition with DSA and double patterning (DSA-DP) hybrid lithography for 7nm technology node. We first analyze the placement error of DSA patterns with different shapes and sizes. We then propose a graph-based approach to reduce the problem size and solve the problem more efficiently without affecting the optimality of the results. The experimental results demonstrate that we can achieve a 50% reduction in both the number of variables and constraints compared to previous work, which leads to a 50X speed up in runtime.
Hybrid UV Lithography for 3D High-Aspect-Ratio Microstructures
International Nuclear Information System (INIS)
Park, Sungmin; Nam, Gyungmok; Kim, Jonghun; Yoon, Sang-Hee
2016-01-01
Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed
Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography
DEFF Research Database (Denmark)
Zhuang, Yanxin; Frandsen, Lars Hagedorn; Harpøth, Anders
2004-01-01
Wavelength tuning of characteristic features of straight photonic crystal waveguides has been obtained by varying the exposure dose in deep UV lithography. The experimental results agree very well with numerical simulations....
Hybrid UV Lithography for 3D High-Aspect-Ratio Microstructures
Energy Technology Data Exchange (ETDEWEB)
Park, Sungmin; Nam, Gyungmok; Kim, Jonghun; Yoon, Sang-Hee [Inha Univ, Incheon (Korea, Republic of)
2016-08-15
Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed.
Fabrication of Partially Transparent Petaled Masks Using Gray Scale Lithography Project
National Aeronautics and Space Administration — Our main objective in this study is to design, fabricate, and analyze the partially transparent petaled(PTP) masks using gray scale lithography to suppress the...
Report of the workshop on transferring X-ray Lithography Synchrotron (XLS) technology to industry
Energy Technology Data Exchange (ETDEWEB)
Marcuse, W.
1987-01-01
This paper reports on plans to develop an x-ray synchrotron for use in lithography. The primary concern of the present paper is technology transfer from national laboratories to private industry. (JDH)
Energy Technology Data Exchange (ETDEWEB)
Rockett, P.D.; Hunter, J.A. [Sandia National Labs., Albuquerque, NM (United States); Kubiak, G.D. [Sandia National Labs., Livermore, CA (United States)] [and others
1997-03-01
During the fiscal years 92-94 a joint group from Sandia/New Mexico and Sandia/California studied the development of new laser-plasma targets for projection x-ray or EUV (extreme ultraviolet) lithography. Our experimental and theoretical analyses incorporated target design as an integral part of the lithographic optical system. Targets studied included thick solid targets, thin-foil metal-coated targets, and cryogenic targets. Our complete measurement suite consisted of x-ray conversion efficiency measurements, source size imaging, source x-ray angular distribution measurements, debris collection, and source EUV spectrum. Target evaluation also included the variation of laser characteristics, such as, laser intensity, spot size, wavelength, pulselength, and pulseshape. Over the course of these experiments we examined targets using KrF (248nm), XeCl (308nm), and CO{sub 2} (10.6 {mu}m) lasers. While debris issues now dominate research in this area, final details were concluded on our understanding of material spectra and radiation transport of 13 run light in laser-plasmas. Additionally, conclusive results were obtained with 308 rim light, showing the pulselength threshold below which plumes no longer limited the transmission of (and thus the conversion efficiency to) 13 nm radiation.
International Nuclear Information System (INIS)
Ayaki, Toshikazu; Yoshikawa, Isao; Niikawa, Norio; Hoshi, Masaharu.
1986-01-01
A Drosophila wing spot test system was used to investigate the effects of low doses of X-rays, gamma rays, and both 2.3 and 14.1 MeV neutrons on somatic chromosome mutation (SCM) induction. The incidence of SCM was significantly increased with any type of radiation, with evident linear dose-response relationship within the range of 3 to 20 cGy. It was estimated that relative biological effectiveness value for SCM induction of 2.3 MeV neutrons to X-rays and gamma rays is much higher than that of 14.1 MeV neutrons to those photons (2.4 vs 8.0). The Drosophila wing spot test system seems to become a promising in vivo experimental method for higher animals in terms of the lack of necessity for a marvelously large number of materials required in conventional test system. (Namekawa, K.)
Thompson, Michael; Tsui, Stella; Leung, Chi Fan
2011-01-01
A sweet spot is referred to in sport as the perfect place to strike a ball with a racquet or bat. It is the point of contact between bat and ball where maximum results can be produced with minimal effort from the hand of the player. Similar physics can be applied to the less inspiring examples of door stops; the perfect position of a door stop is…
Justifications shape ethical blind spots.
Pittarello, Andrea; Leib, Margarita; Gordon-Hecker, Tom; Shalvi, Shaul
2015-06-01
To some extent, unethical behavior results from people's limited attention to ethical considerations, which results in an ethical blind spot. Here, we focus on the role of ambiguity in shaping people's ethical blind spots, which in turn lead to their ethical failures. We suggest that in ambiguous settings, individuals' attention shifts toward tempting information, which determines the magnitude of their lies. Employing a novel ambiguous-dice paradigm, we asked participants to report the outcome of the die roll appearing closest to the location of a previously presented fixation cross on a computer screen; this outcome would determine their pay. We varied the value of the die second closest to the fixation cross to be either higher (i.e., tempting) or lower (i.e., not tempting) than the die closest to the fixation cross. Results of two experiments revealed that in ambiguous settings, people's incorrect responses were self-serving. Tracking participants' eye movements demonstrated that people's ethical blind spots are shaped by increased attention toward tempting information. © The Author(s) 2015.
High resolution patterning for flexible electronics via roll-to-roll nanoimprint lithography
Sabik, Sami; de Riet, Joris; Yakimets, Iryna; Smits, Edsger
2014-03-01
Flexible electronics is a growing field and is currently maturing in applications such as displays, smart packaging, organic light-emitting diodes and organic photovoltaic cells. In order to process on flexible substrates at high throughput and large areas, novel patterning techniques will be essential. Conventional optical lithography is limited in throughput as well as resolution, and requires several alignment steps to generate multi-layered patterns, required for applications such as thin-film transistors. It therefore remains a complex and expensive process. Nanoimprint lithography is an emerging alternative to optical lithography, demonstrating patterning capabilities over a wide range of resolutions, from several microns down to a few nanometres. For display applications, nanoimprint lithography can be used to pattern various layers. Micron sized thin-film transistors for backplane can be fabricated where a self-aligned geometry is used to decrease the number of alignment steps, and increase the overlay accuracy. In addition, nano-structures can be used for optical applications such as anti-reflective surfaces and nano patterned transparent electrodes. Imprint lithography is a fully roll-to-roll compatible process and enables large area and high throughput fabrication for flexible electronics. In this paper we discuss the possibilities and the challenges of large area patterning by roll-to-roll nanoimprint lithography, reviewing micron and nano sized structures realized on our roll-to-roll equipment. Nano patterned transparent electrodes, moth-eye antireflective coatings, and multilevel structures will be covered.
Analysis of multi-e-beam lithography for cutting layers at 7-nm node
Zhao, Lijun; Wei, Yayi; Ye, Tianchun
2016-10-01
Technology node scaling to the 7-nm node, self-aligned quadruple patterning plus cutting/blocking is widely adopted as a lithography solution for critical line and space layers. The cutting/blocking process can be done by 193i or EUV lithography. Due to resolution requirements in both X/Y directions, 193i requires two or three exposures to accomplish the cutting/blocking process, and the overlay among the exposures must be controlled very tightly. EUV can accomplish cutting/blocking by one exposure. However, the extremely high cost of EUV tool and mask, together with not so high throughput, appears to suggest that EUV lithography is not a cost-effective solution. From both technical and cost perspectives, we explore the possibility of using multi-e-beam lithography as an alternative solution for 7-nm cutting/blocking layers. First, we analyze design rules, which define resolution and overlay requirements of the cutting/blocking patterns. Then we report the lithography performance data of our leading-edge multi-e-beam tool and compare them with the cutting/blocking requirements. Finally, we do the cost analysis. Our results indicate that multi-e-beam lithography has a cost per wafer per layer advantage if it can commit a resolution of 32-nm half pitch, an overlay of <2.8 nm, and a throughput of 5 to 10 wph.
Resistance Spot Welding of dissimilar Steels
Directory of Open Access Journals (Sweden)
Ladislav Kolařík
2012-01-01
Full Text Available This paper presents an analysis of the properties of resistance spot welds between low carbon steel and austenitic CrNi stainless steel. The thickness of the welded dissimilar materials was 2 mm. A DeltaSpot welding gun with a process tape was used for welding the dissimilar steels. Resistance spot welds were produced with various welding parameters (welding currents ranging from 7 to 8 kA. Light microscopy, microhardness measurements across the welded joints, and EDX analysis were used to evaluate the quality of the resistance spot welds. The results confirm the applicability of DeltaSpot welding for this combination of materials.
ESA uncovers Geminga's `hot spot'
2004-07-01
16 July 2004 Astronomers using ESA’s X-ray observatory XMM-Newton have detected a small, bright ‘hot spot’ on the surface of the neutron star called Geminga, 500 light-years away. The hot spot is the size of a football field and is caused by the same mechanism producing Geminga’s X-ray tails. This discovery identifies the missing link between the X-ray and gamma-ray emission from Geminga. hi-res Size hi-res: 1284 kb Credits: ESA, P. Caraveo (IASF, Milan) Geminga's hot spot This figure shows the effects of charged particles accelerated in the magnetosphere of Geminga. Panel (a) shows an image taken with the EPIC instrument on board the XMM-Newton observatory. The bright tails, made of particles kicked out by Geminga’s strong magnetic field, trail the neutron star as it moves about in space. Panel (b) shows how electrically charged particles interact with Geminga’s magnetic field. For example, if electrons (blue) are kicked out by the star, positrons (in red) hit the star’s magnetic poles like in an ‘own goal’. Panel (c) illustrates the size of Geminga’s magnetic field (blue) compared to that of the star itself at the centre (purple). The magnetic field is tilted with respect to Geminga’s rotation axis (red). Panel (d) shows the magnetic poles of Geminga, where charged particles hit the surface of the star, creating a two-million degrees hot spot, a region much hotter than the surroundings. As the star spins on its rotation axis, the hot spot comes into view and then disappears, causing the periodic colour change seen by XMM-Newton. An animated version of the entire sequence can be found at: Click here for animated GIF [low resolution, animated GIF, 5536 KB] Click here for AVI [high resolution, AVI with DIVX compression, 19128 KB] hi-res Size hi-res: 371 kb Credits: ESA, P. Caraveo (IASF, Milan) Geminga's hot spot, panel (a) Panel (a) shows an image taken with the EPIC instrument on board the XMM-Newton observatory. The bright tails, made of
Molecular self-assembly for biological investigations and nanoscale lithography
Cheunkar, Sarawut
Small, diffusible molecules when recognized by their binding partners, such as proteins and antibodies, trigger enzymatic activity, cell communication, and immune response. Progress in analytical methods enabling detection, characterization, and visualization of biological dynamics at the molecular level will advance our exploration of complex biological systems. In this dissertation, analytical platforms were fabricated to capture membrane-associated receptors, which are essential proteins in cell signaling pathways. The neurotransmitter serotonin and its biological precursor were immobilized on gold substrates coated with self-assembled monolayers (SAMs) of oligo(ethylene glycol)alkanethiols and their reactive derivatives. The SAM-coated substrates present the biologically selective affinity of immobilized molecules to target native membrane-associated receptors. These substrates were also tested for biospecificity using antibodies. In addition, small-molecule-functionalized platforms, expressing neurotransmitter pharmacophores, were employed to examine kinetic interactions between G-protein-coupled receptors and their associated neurotransmitters. The binding interactions were monitored using a quartz crystal microbalance equipped with liquid-flow injection. The interaction kinetics of G-protein-coupled serotonin 1A receptor and 5-hydroxytyptophan-functionalized surfaces were studied in a real-time, label-free environment. Key binding parameters, such as equilibrium dissociation constants, binding rate constants, and dissociative half-life, were extracted. These parameters are critical for understanding and comparing biomolecular interactions in modern biomedical research. By integrating self-assembly, surface functionalization, and nanofabrication, small-molecule microarrays were created for high-throughput screening. A hybrid soft-lithography, called microcontact insertion printing, was used to pattern small molecules at the dilute scales necessary for highly
High performance Si immersion gratings patterned with electron beam lithography
Gully-Santiago, Michael A.; Jaffe, Daniel T.; Brooks, Cynthia B.; Wilson, Daniel W.; Muller, Richard E.
2014-07-01
Infrared spectrographs employing silicon immersion gratings can be significantly more compact than spectro- graphs using front-surface gratings. The Si gratings can also offer continuous wavelength coverage at high spectral resolution. The grooves in Si gratings are made with semiconductor lithography techniques, to date almost entirely using contact mask photolithography. Planned near-infrared astronomical spectrographs require either finer groove pitches or higher positional accuracy than standard UV contact mask photolithography can reach. A collaboration between the University of Texas at Austin Silicon Diffractive Optics Group and the Jet Propulsion Laboratory Microdevices Laboratory has experimented with direct writing silicon immersion grating grooves with electron beam lithography. The patterning process involves depositing positive e-beam resist on 1 to 30 mm thick, 100 mm diameter monolithic crystalline silicon substrates. We then use the facility JEOL 9300FS e-beam writer at JPL to produce the linear pattern that defines the gratings. There are three key challenges to produce high-performance e-beam written silicon immersion gratings. (1) E- beam field and subfield stitching boundaries cause periodic cross-hatch structures along the grating grooves. The structures manifest themselves as spectral and spatial dimension ghosts in the diffraction limited point spread function (PSF) of the diffraction grating. In this paper, we show that the effects of e-beam field boundaries must be mitigated. We have significantly reduced ghost power with only minor increases in write time by using four or more field sizes of less than 500 μm. (2) The finite e-beam stage drift and run-out error cause large-scale structure in the wavefront error. We deal with this problem by applying a mark detection loop to check for and correct out minuscule stage drifts. We measure the level and direction of stage drift and show that mark detection reduces peak-to-valley wavefront error
An alternating minimization method for blind deconvolution from Poisson data
International Nuclear Information System (INIS)
Prato, Marco; La Camera, Andrea; Bonettini, Silvia
2014-01-01
Blind deconvolution is a particularly challenging inverse problem since information on both the desired target and the acquisition system have to be inferred from the measured data. When the collected data are affected by Poisson noise, this problem is typically addressed by the minimization of the Kullback-Leibler divergence, in which the unknowns are sought in particular feasible sets depending on the a priori information provided by the specific application. If these sets are separated, then the resulting constrained minimization problem can be addressed with an inexact alternating strategy. In this paper we apply this optimization tool to the problem of reconstructing astronomical images from adaptive optics systems, and we show that the proposed approach succeeds in providing very good results in the blind deconvolution of nondense stellar clusters
Beatification: Flattening Poisson brackets for plasma theory and computation
Morrison, P. J.; Viscondi, T. F.; Caldas, I.
2017-10-01
A perturbative method called beatification is presented for producing nonlinear Hamiltonian fluid and plasma theories. Plasma Hamiltonian theories, fluid and kinetic, are naturally described in terms of noncanonical variables. The beatification procedure amounts to finding a transformation that removes the explicit variable dependence from a noncanonical Poisson bracket and replaces it with a fixed dependence on a chosen state in the phase space. As such, beatification is a major step toward casting the Hamiltonian system in its canonical form, thus enabling or facilitating the use of analytical and numerical techniques that require or favor a representation in terms of canonical, or beatified, Hamiltonian variables. Examples will be given. U.S. D.O.E No. #DE-FG02-04ER-54742.
Random walk in dynamically disordered chains: Poisson white noise disorder
International Nuclear Information System (INIS)
Hernandez-Garcia, E.; Pesquera, L.; Rodriguez, M.A.; San Miguel, M.
1989-01-01
Exact solutions are given for a variety of models of random walks in a chain with time-dependent disorder. Dynamic disorder is modeled by white Poisson noise. Models with site-independent (global) and site-dependent (local) disorder are considered. Results are described in terms of an affective random walk in a nondisordered medium. In the cases of global disorder the effective random walk contains multistep transitions, so that the continuous limit is not a diffusion process. In the cases of local disorder the effective process is equivalent to usual random walk in the absence of disorder but with slower diffusion. Difficulties associated with the continuous-limit representation of random walk in a disordered chain are discussed. In particular, the authors consider explicit cases in which taking the continuous limit and averaging over disorder sources do not commute
Particular solutions of generalized Euler-Poisson-Darboux equation
Directory of Open Access Journals (Sweden)
Rakhila B. Seilkhanova
2015-01-01
Full Text Available In this article we consider the generalized Euler-Poisson-Darboux equation $$ {u}_{tt}+\\frac{2\\gamma }{t}{{u}_{t}}={u}_{xx}+{u}_{yy} +\\frac{2\\alpha }{x}{{u}_{x}}+\\frac{2\\beta }{y}{{u}_y},\\quad x>0,\\;y>0,\\;t>0. $$ We construct particular solutions in an explicit form expressed by the Lauricella hypergeometric function of three variables. Properties of each constructed solutions have been investigated in sections of surfaces of the characteristic cone. Precisely, we prove that found solutions have singularity $1/r$ at $r\\to 0$, where ${{r}^2}={{( x-{{x}_0}}^2}+{{( y-{{y}_0}}^2}-{{( t-{{t}_0}}^2}$.
Numerical solution of dynamic equilibrium models under Poisson uncertainty
DEFF Research Database (Denmark)
Posch, Olaf; Trimborn, Timo
2013-01-01
We propose a simple and powerful numerical algorithm to compute the transition process in continuous-time dynamic equilibrium models with rare events. In this paper we transform the dynamic system of stochastic differential equations into a system of functional differential equations...... of the retarded type. We apply the Waveform Relaxation algorithm, i.e., we provide a guess of the policy function and solve the resulting system of (deterministic) ordinary differential equations by standard techniques. For parametric restrictions, analytical solutions to the stochastic growth model and a novel...... solution to Lucas' endogenous growth model under Poisson uncertainty are used to compute the exact numerical error. We show how (potential) catastrophic events such as rare natural disasters substantially affect the economic decisions of households....
Modeling the number of car theft using Poisson regression
Zulkifli, Malina; Ling, Agnes Beh Yen; Kasim, Maznah Mat; Ismail, Noriszura
2016-10-01
Regression analysis is the most popular statistical methods used to express the relationship between the variables of response with the covariates. The aim of this paper is to evaluate the factors that influence the number of car theft using Poisson regression model. This paper will focus on the number of car thefts that occurred in districts in Peninsular Malaysia. There are two groups of factor that have been considered, namely district descriptive factors and socio and demographic factors. The result of the study showed that Bumiputera composition, Chinese composition, Other ethnic composition, foreign migration, number of residence with the age between 25 to 64, number of employed person and number of unemployed person are the most influence factors that affect the car theft cases. These information are very useful for the law enforcement department, insurance company and car owners in order to reduce and limiting the car theft cases in Peninsular Malaysia.
On the FACR( l) algorithm for the discrete Poisson equation
Temperton, Clive
1980-03-01
Direct methods for the solution of the discrete Poisson equation over a rectangle are commonly based either on Fourier transforms or on block-cyclic reduction. The relationship between these two approaches is demonstrated explicitly, and used to derive the FACR( l) algorithm in which the Fourier transform approach is combined with l preliminary steps of cyclic reduction. It is shown that the optimum choice of l leads to an algorithm for which the operation count per mesh point is almost independent of the mesh size. Numerical results concerning timing and round-off error are presented for the N × N Dirichlet problem for various values of N and l. Extensions to more general problems, and to implementation on parallel or vector computers are briefly discussed.
Recent advances in the Poisson/superfish codes
International Nuclear Information System (INIS)
Ryne, R.; Barts, T.; Chan, K.C.D.; Cooper, R.; Deaven, H.; Merson, J.; Rodenz, G.
1992-01-01
We report on advances in the POISSON/SUPERFISH family of codes used in the design and analysis of magnets and rf cavities. The codes include preprocessors for mesh generation and postprocessors for graphical display of output and calculation of auxiliary quantities. Release 3 became available in January 1992; it contains many code corrections and physics enhancements, and it also includes support for PostScript, DISSPLA, GKS and PLOT10 graphical output. Release 4 will be available in September 1992; it is free of all bit packing, making the codes more portable and able to treat very large numbers of mesh points. Release 4 includes the preprocessor FRONT and a new menu-driven graphical postprocessor that runs on workstations under X-Windows and that is capable of producing arrow plots. We will present examples that illustrate the new capabilities of the codes. (author). 6 refs., 3 figs
On the Magnetic Shield for a Vlasov-Poisson Plasma
Caprino, Silvia; Cavallaro, Guido; Marchioro, Carlo
2017-12-01
We study the screening of a bounded body Γ against the effect of a wind of charged particles, by means of a shield produced by a magnetic field which becomes infinite on the border of Γ . The charged wind is modeled by a Vlasov-Poisson plasma, the bounded body by a torus, and the external magnetic field is taken close to the border of Γ . We study two models: a plasma composed by different species with positive or negative charges, and finite total mass of each species, and another made of many species of the same sign, each having infinite mass. We investigate the time evolution of both systems, showing in particular that the plasma particles cannot reach the body. Finally we discuss possible extensions to more general initial data. We show also that when the magnetic lines are straight lines, (that imposes an unbounded body), the previous results can be improved.
Statistical modelling of Poisson/log-normal data
International Nuclear Information System (INIS)
Miller, G.
2007-01-01
In statistical data fitting, self consistency is checked by examining the closeness of the quantity Χ 2 /NDF to 1, where Χ 2 is the sum of squares of data minus fit divided by standard deviation, and NDF is the number of data minus the number of fit parameters. In order to calculate Χ 2 one needs an expression for the standard deviation. In this note several alternative expressions for the standard deviation of data distributed according to a Poisson/log-normal distribution are proposed and evaluated by Monte Carlo simulation. Two preferred alternatives are identified. The use of replicate data to obtain uncertainty is problematic for a small number of replicates. A method to correct this problem is proposed. The log-normal approximation is good for sufficiently positive data. A modification of the log-normal approximation is proposed, which allows it to be used to test the hypothesis that the true value is zero. (authors)
Tetrahedral meshing via maximal Poisson-disk sampling
Guo, Jianwei
2016-02-15
In this paper, we propose a simple yet effective method to generate 3D-conforming tetrahedral meshes from closed 2-manifold surfaces. Our approach is inspired by recent work on maximal Poisson-disk sampling (MPS), which can generate well-distributed point sets in arbitrary domains. We first perform MPS on the boundary of the input domain, we then sample the interior of the domain, and we finally extract the tetrahedral mesh from the samples by using 3D Delaunay or regular triangulation for uniform or adaptive sampling, respectively. We also propose an efficient optimization strategy to protect the domain boundaries and to remove slivers to improve the meshing quality. We present various experimental results to illustrate the efficiency and the robustness of our proposed approach. We demonstrate that the performance and quality (e.g., minimal dihedral angle) of our approach are superior to current state-of-the-art optimization-based approaches.
Cryoconservation du sperme et des embryons de poissons
Maisse, Gérard; Labbé, Catherine; Ogier de Baulny, Bénédicte; Leveroni Calvi, Sylvia; Haffray, Pierrick
1998-01-01
Le développement des programmes de sélection génétique en pisciculture et la protection de la biodiversité de l’ichtyofaune sauvage justifient la création de cryo-banques de sperme et d’embryons de poissons. Les travaux sur la formulation des dilueurs de congélation montrent que l’on doit tenir compte à la fois de l’espèce cible, du type cellulaire concerné et des interactions entre les différents composants du dilueur. L’aptitude à la cryoconservation du sperme est très variable suivant les ...
Bases chimiosensorielles du comportement alimentaire chez les poissons
Saglio, P.
1981-01-01
Le comportement alimentaire, indispensable à la survie de l'individu et donc de l'espèce, occupe à ce titre une position de première importance dans la hiérarchie des comportements fondamentaux qui tous en dépendent très étroitement. Chez les poissons, cette prééminence se trouve illustrée par l'extrême diversité des supports sensoriels impliqués et des expressions comportementales qui leur sont liées. A la suite d'un certain nombre de mises en évidence neurophysiologiques et éthologiques de ...
SPOTting model parameters using a ready-made Python package
Houska, Tobias; Kraft, Philipp; Breuer, Lutz
2015-04-01
The selection and parameterization of reliable process descriptions in ecological modelling is driven by several uncertainties. The procedure is highly dependent on various criteria, like the used algorithm, the likelihood function selected and the definition of the prior parameter distributions. A wide variety of tools have been developed in the past decades to optimize parameters. Some of the tools are closed source. Due to this, the choice for a specific parameter estimation method is sometimes more dependent on its availability than the performance. A toolbox with a large set of methods can support users in deciding about the most suitable method. Further, it enables to test and compare different methods. We developed the SPOT (Statistical Parameter Optimization Tool), an open source python package containing a comprehensive set of modules, to analyze and optimize parameters of (environmental) models. SPOT comes along with a selected set of algorithms for parameter optimization and uncertainty analyses (Monte Carlo, MC; Latin Hypercube Sampling, LHS; Maximum Likelihood, MLE; Markov Chain Monte Carlo, MCMC; Scuffled Complex Evolution, SCE-UA; Differential Evolution Markov Chain, DE-MCZ), together with several likelihood functions (Bias, (log-) Nash-Sutcliff model efficiency, Correlation Coefficient, Coefficient of Determination, Covariance, (Decomposed-, Relative-, Root-) Mean Squared Error, Mean Absolute Error, Agreement Index) and prior distributions (Binomial, Chi-Square, Dirichlet, Exponential, Laplace, (log-, multivariate-) Normal, Pareto, Poisson, Cauchy, Uniform, Weibull) to sample from. The model-independent structure makes it suitable to analyze a wide range of applications. We apply all algorithms of the SPOT package in three different case studies. Firstly, we investigate the response of the Rosenbrock function, where the MLE algorithm shows its strengths. Secondly, we study the Griewank function, which has a challenging response surface for
Radio pulsar glitches as a state-dependent Poisson process
Fulgenzi, W.; Melatos, A.; Hughes, B. D.
2017-10-01
Gross-Pitaevskii simulations of vortex avalanches in a neutron star superfluid are limited computationally to ≲102 vortices and ≲102 avalanches, making it hard to study the long-term statistics of radio pulsar glitches in realistically sized systems. Here, an idealized, mean-field model of the observed Gross-Pitaevskii dynamics is presented, in which vortex unpinning is approximated as a state-dependent, compound Poisson process in a single random variable, the spatially averaged crust-superfluid lag. Both the lag-dependent Poisson rate and the conditional distribution of avalanche-driven lag decrements are inputs into the model, which is solved numerically (via Monte Carlo simulations) and analytically (via a master equation). The output statistics are controlled by two dimensionless free parameters: α, the glitch rate at a reference lag, multiplied by the critical lag for unpinning, divided by the spin-down rate; and β, the minimum fraction of the lag that can be restored by a glitch. The system evolves naturally to a self-regulated stationary state, whose properties are determined by α/αc(β), where αc(β) ≈ β-1/2 is a transition value. In the regime α ≳ αc(β), one recovers qualitatively the power-law size and exponential waiting-time distributions observed in many radio pulsars and Gross-Pitaevskii simulations. For α ≪ αc(β), the size and waiting-time distributions are both power-law-like, and a correlation emerges between size and waiting time until the next glitch, contrary to what is observed in most pulsars. Comparisons with astrophysical data are restricted by the small sample sizes available at present, with ≤35 events observed per pulsar.
A geometric multigrid Poisson solver for domains containing solid inclusions
Botto, Lorenzo
2013-03-01
A Cartesian grid method for the fast solution of the Poisson equation in three-dimensional domains with embedded solid inclusions is presented and its performance analyzed. The efficiency of the method, which assume Neumann conditions at the immersed boundaries, is comparable to that of a multigrid method for regular domains. The method is light in terms of memory usage, and easily adaptable to parallel architectures. Tests with random and ordered arrays of solid inclusions, including spheres and ellipsoids, demonstrate smooth convergence of the residual for small separation between the inclusion surfaces. This feature is important, for instance, in simulations of nearly-touching finite-size particles. The implementation of the method, “MG-Inc”, is available online. Catalogue identifier: AEOE_v1_0 Program summary URL:http://cpc.cs.qub.ac.uk/summaries/AEOE_v1_0.html Program obtainable from: CPC Program Library, Queen's University, Belfast, N. Ireland Licensing provisions: Standard CPC licence, http://cpc.cs.qub.ac.uk/licence/licence.html No. of lines in distributed program, including test data, etc.: 19068 No. of bytes in distributed program, including test data, etc.: 215118 Distribution format: tar.gz Programming language: C++ (fully tested with GNU GCC compiler). Computer: Any machine supporting standard C++ compiler. Operating system: Any OS supporting standard C++ compiler. RAM: About 150MB for 1283 resolution Classification: 4.3. Nature of problem: Poisson equation in domains containing inclusions; Neumann boundary conditions at immersed boundaries. Solution method: Geometric multigrid with finite-volume discretization. Restrictions: Stair-case representation of the immersed boundaries. Running time: Typically a fraction of a minute for 1283 resolution.
On the Fractional Poisson Process and the Discretized Stable Subordinator
Directory of Open Access Journals (Sweden)
Rudolf Gorenflo
2015-08-01
Full Text Available We consider the renewal counting number process N = N(t as a forward march over the non-negative integers with independent identically distributed waiting times. We embed the values of the counting numbers N in a “pseudo-spatial” non-negative half-line x ≥ 0 and observe that for physical time likewise we have t ≥ 0. Thus we apply the Laplace transform with respect to both variables x and t. Applying then a modification of the Montroll-Weiss-Cox formalism of continuous time random walk we obtain the essential characteristics of a renewal process in the transform domain and, if we are lucky, also in the physical domain. The process t = t(N of accumulation of waiting times is inverse to the counting number process, in honour of the Danish mathematician and telecommunication engineer A.K. Erlang we call it the Erlang process. It yields the probability of exactly n renewal events in the interval (0; t]. We apply our Laplace-Laplace formalism to the fractional Poisson process whose waiting times are of Mittag-Leffler type and to a renewal process whose waiting times are of Wright type. The process of Mittag-Leffler type includes as a limiting case the classical Poisson process, the process of Wright type represents the discretized stable subordinator and a re-scaled version of it was used in our method of parametric subordination of time-space fractional diffusion processes. Properly rescaling the counting number process N(t and the Erlang process t(N yields as diffusion limits the inverse stable and the stable subordinator, respectively.
A multiresolution method for solving the Poisson equation using high order regularization
DEFF Research Database (Denmark)
Hejlesen, Mads Mølholm; Walther, Jens Honore
2016-01-01
and regularized Green's functions corresponding to the difference in the spatial resolution between the patches. The full solution is obtained utilizing the linearity of the Poisson equation enabling super-position of solutions. We show that the multiresolution Poisson solver produces convergence rates......We present a novel high order multiresolution Poisson solver based on regularized Green's function solutions to obtain exact free-space boundary conditions while using fast Fourier transforms for computational efficiency. Multiresolution is a achieved through local refinement patches...
HMM filtering and parameter estimation of an electricity spot price model
International Nuclear Information System (INIS)
Erlwein, Christina; Benth, Fred Espen; Mamon, Rogemar
2010-01-01
In this paper we develop a model for electricity spot price dynamics. The spot price is assumed to follow an exponential Ornstein-Uhlenbeck (OU) process with an added compound Poisson process. In this way, the model allows for mean-reversion and possible jumps. All parameters are modulated by a hidden Markov chain in discrete time. They are able to switch between different economic regimes representing the interaction of various factors. Through the application of reference probability technique, adaptive filters are derived, which in turn, provide optimal estimates for the state of the Markov chain and related quantities of the observation process. The EM algorithm is applied to find optimal estimates of the model parameters in terms of the recursive filters. We implement this self-calibrating model on a deseasonalised series of daily spot electricity prices from the Nordic exchange Nord Pool. On the basis of one-step ahead forecasts, we found that the model is able to capture the empirical characteristics of Nord Pool spot prices. (author)
Evaluation of EUV resist performance using interference lithography
Buitrago, E.; Yildirim, O.; Verspaget, C.; Tsugama, N.; Hoefnagels, R.; Rispens, G.; Ekinci, Y.
2015-03-01
Extreme ultraviolet lithography (EUVL) stands as the most promising solution for the fabrication of future technology nodes in the semiconductor industry. Nonetheless, the successful introduction of EUVL into the extremely competitive and stringent high-volume manufacturing (HVM) phase remains uncertain partly because of the still limiting performance of EUV resists below 16 nm half-pitch (HP) resolution. Particularly, there exists a trade-off relationship between resolution (half-pitch), sensitivity (dose) and line-edge roughness (LER) that can be achieved with existing materials. This trade-off ultimately hampers their performance and extendibility towards future technology nodes. Here we present a comparative study of highly promising chemically amplified resists (CARs) that have been evaluated using the EUV interference lithography (EUV-IL) tool at the Swiss Light Source (SLS) synchrotron facility in the Paul Scherrer Institute (PSI). In this study we have focused on the performance qualification of different resists mainly for 18 nm and 16 nm half-pitch line/space resolution (L/S = 1:1). Among the most promising candidates tested, there are a few choices that allow for 16 nm HP resolution to be achieved with high exposure latitude (up to ~ 33%), low LER (down to 3.3 nm or ~ 20% of critical dimension CD) and low dose-to-size (or best-energy, BE) < 41 mJ/cm2 values. Patterning was even demonstrated down to 12 nm HP with one of CARs (R1UL1) evaluated for their extendibility beyond the 16 nm HP resolution. 11 nm HP patterning with some pattern collapse and well resolved patterns down 12 nm were also demonstrated with another CAR (R15UL1) formulated for 16 nm HP resolution and below. With such resist it was possible even to obtain a small process window for 14 nm HP processing with an EL ~ 8% (BE ~ 37 mJ/cm2, LER ~ 4.5 nm). Though encouraging, fulfilling all of the requirements necessary for high volume production, such as high resolution, low LER, high photon
Mask characterization for CDU budget breakdown in advanced EUV lithography
Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho
2012-11-01
As the ITRS Critical Dimension Uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and a high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. In this paper we will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for an advanced EUV lithography with 1D and 2D feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CD's and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples in this paper. Also mask stack reflectivity variations should be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We observed also MEEF-through-field fingerprints in the studied EUV cases. Variations of MEEF may also play a role for the total intrafield CDU and may be taken into account for EUV Lithography. We characterized MEEF-through-field for the reviewed features, the results to be discussed in our paper, but further analysis of this phenomenon is required. This comprehensive approach to characterization of the mask part of EUV CDU characterization delivers an accurate and integral CDU Budget
Amine control for DUV lithography: identifying hidden sources
Kishkovich, Oleg P.; Larson, Carl E.
2000-06-01
The impact of airborne basic molecular contamination (MB) on the performance of chemically amplified (CA) resist systems has been a long standing problem. Low ppb levels of MB may be sufficient for robust 0.25 micrometer lithography with today's advanced CA resist systems combined with adequate chemical air filtration. However, with minimum CD targets heading below 150 nm, the introduction of new resist chemistries for Next Generation Lithography, and the trend towards thinner resists, the impact of MB at low and sub-ppb levels again becomes a critical manufacturing issue. Maximizing process control at aggressive feature sizes requires that the level of MB be maintained below a certain limit, which depends on such parameters as the sensitivity of the CA resist, the type of production tools, product mix, and process characteristics. Three approaches have been identified to reduce the susceptibility of CA resists to MB: effective chemical air filtration, modifications to resist chemistry/processing and cleanroom protocols involving MB monitoring and removal of MB sources from the fab. The final MB concentration depends on the effectiveness of filtration resources and on the total pollution originating from different sources in and out of the cleanroom. There are many well-documented sources of MB. Among these are: ambient air; polluted exhaust from other manufacturing areas re-entering the cleanroom through make-up air handlers; manufacturing process chemicals containing volatile molecular bases; certain cleanroom construction materials, such as paint and ceiling tiles; and volatile, humidifier system boiler additives (corrosion inhibitors), such as morpholine, cyclohexylamine, and dimethylaminoethanol. However, there is also an indeterminate number of other 'hidden' pollution sources, which are neither obvious nor well-documented. None of these sources are new, but they had little impact on earlier semiconductor manufacturing processes because the contamination
Watermarking spot colors in packaging
Reed, Alastair; Filler, TomáÅ.¡; Falkenstern, Kristyn; Bai, Yang
2015-03-01
In January 2014, Digimarc announced Digimarc® Barcode for the packaging industry to improve the check-out efficiency and customer experience for retailers. Digimarc Barcode is a machine readable code that carries the same information as a traditional Universal Product Code (UPC) and is introduced by adding a robust digital watermark to the package design. It is imperceptible to the human eye but can be read by a modern barcode scanner at the Point of Sale (POS) station. Compared to a traditional linear barcode, Digimarc Barcode covers the whole package with minimal impact on the graphic design. This significantly improves the Items per Minute (IPM) metric, which retailers use to track the checkout efficiency since it closely relates to their profitability. Increasing IPM by a few percent could lead to potential savings of millions of dollars for retailers, giving them a strong incentive to add the Digimarc Barcode to their packages. Testing performed by Digimarc showed increases in IPM of at least 33% using the Digimarc Barcode, compared to using a traditional barcode. A method of watermarking print ready image data used in the commercial packaging industry is described. A significant proportion of packages are printed using spot colors, therefore spot colors needs to be supported by an embedder for Digimarc Barcode. Digimarc Barcode supports the PANTONE spot color system, which is commonly used in the packaging industry. The Digimarc Barcode embedder allows a user to insert the UPC code in an image while minimizing perceptibility to the Human Visual System (HVS). The Digimarc Barcode is inserted in the printing ink domain, using an Adobe Photoshop plug-in as the last step before printing. Since Photoshop is an industry standard widely used by pre-press shops in the packaging industry, a Digimarc Barcode can be easily inserted and proofed.
Four-mirror extreme ultraviolet (EUV) lithography projection system
Cohen, Simon J; Jeong, Hwan J; Shafer, David R
2000-01-01
The invention is directed to a four-mirror catoptric projection system for extreme ultraviolet (EUV) lithography to transfer a pattern from a reflective reticle to a wafer substrate. In order along the light path followed by light from the reticle to the wafer substrate, the system includes a dominantly hyperbolic convex mirror, a dominantly elliptical concave mirror, spherical convex mirror, and spherical concave mirror. The reticle and wafer substrate are positioned along the system's optical axis on opposite sides of the mirrors. The hyperbolic and elliptical mirrors are positioned on the same side of the system's optical axis as the reticle, and are relatively large in diameter as they are positioned on the high magnification side of the system. The hyperbolic and elliptical mirrors are relatively far off the optical axis and hence they have significant aspherical components in their curvatures. The convex spherical mirror is positioned on the optical axis, and has a substantially or perfectly spherical shape. The spherical concave mirror is positioned substantially on the opposite side of the optical axis from the hyperbolic and elliptical mirrors. Because it is positioned off-axis to a degree, the spherical concave mirror has some asphericity to counter aberrations. The spherical concave mirror forms a relatively large, uniform field on the wafer substrate. The mirrors can be tilted or decentered slightly to achieve further increase in the field size.
100-nm gate lithography for double-gate transistors
Krasnoperova, Azalia A.; Zhang, Ying; Babich, Inna V.; Treichler, John; Yoon, Jung H.; Guarini, Kathryn; Solomon, Paul M.
2001-09-01
The double gate field effect transistor (FET) is an exploratory device that promises certain performance advantages compared to traditional CMOS FETs. It can be scaled down further than the traditional devices because of the greater electrostatic control by the gates on the channel (about twice as short a channel length for the same gate oxide thickness), has steeper sub-threshold slope and about double the current for the same width. This paper presents lithographic results for double gate FET's developed at IBM's T. J. Watson Research Center. The device is built on bonded wafers with top and bottom gates self-aligned to each other. The channel is sandwiched between the top and bottom polysilicon gates and the gate length is defined using DUV lithography. An alternating phase shift mask was used to pattern gates with critical dimensions of 75 nm, 100 nm and 125 nm in photoresist. 50 nm gates in photoresist have also been patterned by 20% over-exposure of nominal 100 nm lines. No trim mask was needed because of a specific way the device was laid out. UV110 photoresist from Shipley on AR-3 antireflective layer were used. Process windows, developed and etched patterns are presented.
Modular EUV Source for the next generation lithography
International Nuclear Information System (INIS)
Sublemontier, O.; Rosset-Kos, M.; Ceccotti, T.; Hergott, J.F.; Auguste, Th.; Normand, D.; Schmidt, M.; Beaumont, F.; Farcage, D.; Cheymol, G.; Le Caro, J.M.; Cormont, Ph.; Mauchien, P.; Thro, P.Y.; Skrzypczak, J.; Muller, S.; Marquis, E.; Barthod, B.; Gaurand, I.; Davenet, M.; Bernard, R.
2011-01-01
The present work, performed in the frame of the EXULITE project, was dedicated to the design and characterization of a laser-plasma-produced extreme ultraviolet (EUV) source prototype at 13.5 nm for the next generation lithography. It was conducted in cooperation with two laboratories from CEA, ALCATEL and THALES. One of our approach originalities was the laser scheme modularity. Six Nd:YAG laser beams were focused at the same time on a xenon filament jet to generate the EUV emitting plasma. Multiplexing has important industrial advantages and led to interesting source performances in terms of in-band power, stability and angular emission properties with the filament jet target. A maximum conversion efficiency (CE) value of 0.44% in 2π sr and 2% bandwidth was measured, which corresponds to a maximum in band EUV mean power of 7.7 W at a repetition rate of 6 kHz. The EUV emission was found to be stable and isotropic in these conditions. (authors)
New data postprocessing for e-beam projection lithography
Okamoto, Kazuya; Kamijo, Koichi; Kojima, Shinichi; Minami, Hideyuki; Okino, Teruaki
2001-08-01
In electron beam projection lithography (EPL), one of the most crucial tasks is to develop a data post-processing system, namely, a specific tool to expose a faithful pattern for every subfield on the wafer based on the pattern layout data. This system includes two basic flows. The 1st flow is common for reticle fabrication, and the 2nd flow is unique for EPL. During the 2nd flow, based on the LSI pattern data, electron optics space-charge effect correction will be automatically and rapidly executed and output to the EPL system in order to adjust parameters such as focus, magnification, rotation and astigmatism. In addition, this system should perform such tasks as segmentations of subfields (including complementary division), arrangement of stripes and reticlets, and alignment mark insertion. For proximity effect correction, we will first use a pattern shape modulation first. Shape modification at stitching boundaries is also investigated. In summary, to achieve conformable EPL delivery to customers, a new data post- processing system is developed in collaboration with some suppliers.
3-D holographic lithography of organic-inorganic hybrids
Energy Technology Data Exchange (ETDEWEB)
Salauen, M. [LMGP, INPG, UMR 5628, 3, Parvis Louis Neel, BP 257, 38016 Grenoble Cedex (France)], E-mail: mathieu.salaun@inpg.fr; Audier, M. [LMGP, INPG, UMR 5628, 3, Parvis Louis Neel, BP 257, 38016 Grenoble Cedex (France); Delyon, F.; Duneau, M. [CPHT, Ecole Polytechnique, UMR 7644, F-91128 Palaiseau Cedex (France)
2007-12-15
Fabrications of ordered three-dimensional structures with submicron lattice constants were performed on organic-inorganic hybrids using a holographic lithography technique recently reported in the literature. The possibility of such a patterning has previously been demonstrated from single nanosecond laser pulse irradiation of thin films of epoxy photoresist and mixtures of methacrylate-alkoxy-silane with Zr or Ti alkoxides. In the present work, UV irradiation of similar hybrid resins were carried out through repeated laser pulses of low energy with a twofold objective: (i) to study the interference stability for future chemical gas phase decomposition experiments and (ii) to obtain patterning through large film thickness (e.g. 1 mm). The influence of several parameters on the structuration was examined from observations by scanning electron microscopy and optical diffraction. Many interdependent parameters were considered in different steps of the process, namely (i) hybrid resin preparations with required properties of stability, transparency and viscosity, (ii) film coating on different substrates, (iii) UV irradiation (energy and number of laser pulses), (iv) ultrasonic dissolution of monomer, and (v) sample drying. As results, different structuration resolutions were observed as a function of these parameters. But if the influence of a few parameters was easily understood and controlled, it has also appeared that it was not the case of all of them.
3-D holographic lithography of organic inorganic hybrids
Salaün, M.; Audier, M.; Delyon, F.; Duneau, M.
2007-12-01
Fabrications of ordered three-dimensional structures with submicron lattice constants were performed on organic-inorganic hybrids using a holographic lithography technique recently reported in the literature. The possibility of such a patterning has previously been demonstrated from single nanosecond laser pulse irradiation of thin films of epoxy photoresist and mixtures of methacrylate-alkoxy-silane with Zr or Ti alkoxides. In the present work, UV irradiation of similar hybrid resins were carried out through repeated laser pulses of low energy with a twofold objective: (i) to study the interference stability for future chemical gas phase decomposition experiments and (ii) to obtain patterning through large film thickness (e.g. 1 mm). The influence of several parameters on the structuration was examined from observations by scanning electron microscopy and optical diffraction. Many interdependent parameters were considered in different steps of the process, namely (i) hybrid resin preparations with required properties of stability, transparency and viscosity, (ii) film coating on different substrates, (iii) UV irradiation (energy and number of laser pulses), (iv) ultrasonic dissolution of monomer, and (v) sample drying. As results, different structuration resolutions were observed as a function of these parameters. But if the influence of a few parameters was easily understood and controlled, it has also appeared that it was not the case of all of them.
Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography
Energy Technology Data Exchange (ETDEWEB)
DeVetter, Brent M.; Bernacki, Bruce E.; Bennett, Wendy D.; Schemer-Kohrn, Alan; Alvine, Kyle J.
2017-01-01
Within recent years, the field of plasmonics has exploded as researchers have demonstrated exciting applications related to chemical and optical sensing in combination with new nanofabrication techniques. A plasmon is a quantum of charge density oscillation that lends nanoscale metals such as gold and silver unique optical properties. In particular, gold and silver nanoparticles exhibit localized surface plasmon resonances—collective charge density oscillations on the surface of the nanoparticle—in the visible spectrum. Here, we focus on the fabrication of periodic arrays of anisotropic plasmonic nanostructures. These half-shell (or nanocup) structures can exhibit additional unique light-bending and polarization dependent optical properties that simple isotropic nanostructures cannot. Researchers are interested in the fabrication of periodic arrays of nanocups for a wide variety of applications such as low-cost optical devices, surface-enhanced Raman scattering, and tamper indication. We present a scalable technique based on colloidal lithography in which it is possible to easily fabricate large periodic arrays of nanocups using spin-coating and self-assembled commercially available polymeric nanospheres. Electron microscopy and optical spectroscopy from the visible to near-IR was performed to confirm successful nanocup fabrication. We conclude with a demonstration of the transfer of nanocups to a flexible, conformal adhesive film.
Print-to-pattern dry film photoresist lithography
International Nuclear Information System (INIS)
Garland, Shaun P; Murphy, Terrence M Jr; Pan, Tingrui
2014-01-01
Here we present facile microfabrication processes, referred to as print-to-pattern dry film photoresist (DFP) lithography, that utilize the combined advantages of wax printing and DFP to produce micropatterned substrates with high resolution over a large surface area in a non-cleanroom setting. The print-to-pattern methods can be performed in an out-of-cleanroom environment making microfabrication much more accessible to minimally equipped laboratories. Two different approaches employing either wax photomasks or wax etchmasks from a solid ink desktop printer have been demonstrated that allow the DFP to be processed in a negative tone or positive tone fashion, respectively, with resolutions of 100 µm. The effect of wax melting on resolution and as a bonding material was also characterized. In addition, solid ink printers have the capacity to pattern large areas with high resolution, which was demonstrated by stacking DFP layers in a 50 mm × 50 mm woven pattern with 1 mm features. By using an office printer to generate the masking patterns, the mask designs can be easily altered in a graphic user interface to enable rapid prototyping. (technical note)
Modelling the deformation process of flexible stamps for nanoimprint lithography
DEFF Research Database (Denmark)
Sonne, Mads Rostgaard
The present thesis is devoted to numerical modelling of the deformation process of flexible stamps for nanoimprint lithography (NIL). The purpose of those models is to be able to predict the deformation and stretch of the flexixble stamps in order to take that into account when designing the plan...... 2D silicon master used in the NIL process. Two different manufacturing processes are investigated; (i) Embossing of an electroplated nickel foil into a hydrogen silsesquioxane (HSQ) polymer resist on a double-curved surface, (ii) NIL of a flexible polytetrafluoroethylene (PTFE) stamps...... into a polymethyl methacrylate (PMMA) resist. Challenges comprise several non-linear phenomena. First of all geometrical non-linearities arising from the inherent large strains and deformations during the process are modelled. Then, the constitutive behaviors of the nickel foil and the PTFE polymer during...... deformation are addressed. This is achieved by a general elasto-plastic description for the nickel foil and a viscoelastic-viscoplastic model for the PTFE material, in which the material parameters are found. Last, the contact conditions between the deforming stamp and the injection moulding tool insert...
Nanosphere Lithography: Fabrication of Periodic Arrays of Nanoholes
Juremi, Nor Rashidah Md; Mustafa, Ubaidillah; Agam, Mohd Arif; Nur, Hadi
2011-05-01
Polystyrene nanosphere (PSNs) with 500 nm in diameter can be shrunk when exposed to reactive ion etching (RIE) in various gases mixture (Ar, O2 and Ar/ O2) with varied duration of exposure time (5-25 s). These etched PSNs will act as lithography mask to fabricate periodic nanohole arrays (PNHAs), where the lift-off of the PSNs will left the substrate surface with thin layer films of deposited Pt or Au with periodic nanoholes scattered on the substrate surface. We plotted the average diameter of the etched PSNs, later sputtered with 75.0 nm of Pt, used as lithographic mask to fabricate PNHAs with sizes ranging from 200-400 nm. Reducing the diameter of PSNs by means increased the gap between the PSNs will affect the amount of deposited Pt on the Si substrate, thus controlling the nanoholes size. PSNs were acting as nano-templates which after removal process such as by sonicating the sample in organic solvent, can be useful in fabricating PNHAs that can be used as optical and catalysts research. Field Emission Scanning Electron Microscopy (FE-SEM) was used to characterize the PSNs and PNHAs.
Injection Compression Molding of Replica Molds for Nanoimprint Lithography
Directory of Open Access Journals (Sweden)
Keisuke Nagato
2014-03-01
Full Text Available As a breakthrough in the cost and durability of molds for nanoimprint lithography (NIL, replica molds are fabricated by injection compression molding (ICM. ICM is commonly used for optical disks such as DVDs or Blu-ray disks and is also a practical fabrication method for nanostructures. In this paper, I successfully demonstrated the fabrication of cycloolefin polymer replica molds with structures smaller than 60 nm by ICM. Furthermore, ultraviolet (UV-NIL using these replica molds was demonstrated. UV-cured resist was replicated over an area of 60 mm diameter. The degree of replication by UV-NIL in the first usage of each replica mold had good repeatability. Because ICM is a high-throughput, low-cost process, the replica mold can be disposed of after a certain time for UV-NIL. This method leads to a high-integrity UV-NIL process of patterned media because multiple large-area replica molds can be fabricated simultaneously.
Superhydrophobic hierarchical arrays fabricated by a scalable colloidal lithography approach.
Kothary, Pratik; Dou, Xuan; Fang, Yin; Gu, Zhuxiao; Leo, Sin-Yen; Jiang, Peng
2017-02-01
Here we report an unconventional colloidal lithography approach for fabricating a variety of periodic polymer nanostructures with tunable geometries and hydrophobic properties. Wafer-sized, double-layer, non-close-packed silica colloidal crystal embedded in a polymer matrix is first assembled by a scalable spin-coating technology. The unusual non-close-packed crystal structure combined with a thin polymer film separating the top and the bottom colloidal layers render great versatility in templating periodic nanostructures, including arrays of nanovoids, nanorings, and hierarchical nanovoids. These different geometries result in varied fractions of entrapped air in between the templated nanostructures, which in turn lead to different apparent water contact angles. Superhydrophobic surfaces with >150° water contact angles and <5° contact angle hysteresis are achieved on fluorosilane-modified polymer hierarchical nanovoid arrays with large fractions of entrapped air. The experimental contact angle measurements are complemented with theoretical predictions using the Cassie's model to gain insights into the fundamental microstructure-dewetting property relationships. The experimental and theoretical contact angles follow the same trends as determined by the unique hierarchical structures of the templated periodic arrays. Copyright © 2016 Elsevier Inc. All rights reserved.
Evaluation of fluorinated dissolution inhibitors for 157-nm lithography
Hamad, Alyssandrea H.; Houlihan, Francis M.; Seger, Larry; Chang, Chun; Ober, Christopher K.
2003-06-01
Fluorinated diesters were synthesized and evaluated as dissolution inhibitors (DIs) for 157 nm lithography. The results of dissolution rate measurements, exposure studies, and etching experiments on blends of fluorinated polymers containing these dissolution inhibitors are reported. It was shown that the DIs effectively slow the dissolution rate of the matrix polymer, poly(hexafluorohydroxyisopropyl styrene) (PHFHIPS). Etching studies show that they enhance the plasma etch resistance of poly(methyl methacrylate) using tetrafluoromethane plasma. Addition of the best performing dissolution inhibitor, cyclohexane-1,4-dicarboxylic acid bis-(1-cyclohexyl-2,2,2-trifluoro-1-methyl-ethyl) ester) (FCDE1) to candidate 157 nm photoresist polymers, Duvcor and poly(hexafluorohydroxyisopropyl styrene)-co-poly(t-butyl methacrylate) [pPHFHIPS-co-pt-BMA], improves the imaging behavior of these polymers. Our attempts to elucidate the mechanism of dissolution inhibition for this series of compounds will be discussed. Fourier Transform Infrared (FTIR) studies in conjunction with dissolution rate measurements performed on a series of DI analogues suggest a mechanism based on hydrogen bonding.
Thermo-curable epoxy systems for nanoimprint lithography
International Nuclear Information System (INIS)
Wu, Chun-Chang; Hsu, Steve Lien-Chung
2010-01-01
In this work, we have used solvent-free thermo-curable epoxy systems for low-pressure and moderate-temperature nanoimprint lithography (NIL). The curing kinetic parameters and conversion of diglycidyl ether of bisphenol A (DGEBA) resin with different ambient-cure 930 and 954 hardeners were studied by the isothermal DSC technique. They are useful for the study of epoxy resins in the imprinting application. The DGEBA/930 and DGEBA/954 epoxy resists can be imprinted to obtain high-density nano- and micro-scale patterns on a flexible indium tin oxide/poly(ethylene terephthalate) (ITO/PET) substrate. The DGEBA/930 epoxy resin is not only suitable for resist material, but also for plastic mold material. Highly dense nanometer patterns can be successfully imprinted using a UV-curable resist from the DGEBA/930 epoxy mold. Using the replicated DGEBA/930 epoxy mold instead of the expensive master can prevent brittle failure of the silicon molds in the NIL
Directory of Open Access Journals (Sweden)
Hasan ŞAHİN
2002-01-01
Full Text Available This study applies a Poisson regression model to annual Turkish strikes data of the period of 1964-1998. The Poisson regression model is preferable when the dependent variable is count data. Economical and social variables are used as determinants of the number of strikes. Empirical results show that the unemployment rate and a dummy variable that takes 0 before 1980 1 otherwise are significantly affects the number of strikes.
International Nuclear Information System (INIS)
Samii, M.V.
1992-01-01
In the last decade, the oil futures market has risen to prominence and has become a major factor in influencing oil market psychology and the crude oil market. On a normal day, over 92 thousand contracts, the equivalent of 92 million barrels per day, change hands on the New York Mercantile Exchange, NYMEX. This market has provided a vehicle for hedging against risk. At the same time, it has also created opportunities for speculation. Those who previously were unable to participate in oil market transactions can now become involved through the futures market. The large number of participants in the future market and the availability of information has made this market more efficient and transparent, relative to the crude oil market. While there has been considerable in-depth analysis of other future markets, relatively little theoretical attention has focused on that of oil. This paper looks at the following issues. First, what is the relationship between futures and spot oil prices? And secondly, are futures prices a good predictor of spot crude prices in the future? (author)
Directory of Open Access Journals (Sweden)
John E Fa
Full Text Available Wild animals are a primary source of protein (bushmeat for people living in or near tropical forests. Ideally, the effect of bushmeat harvests should be monitored closely by making regular estimates of offtake rate and size of stock available for exploitation. However, in practice, this is possible in very few situations because it requires both of these aspects to be readily measurable, and even in the best case, entails very considerable time and effort. As alternative, in this study, we use high-resolution, environmental favorability models for terrestrial mammals (N = 165 in Central Africa to map areas of high species richness (hot spots and hunting susceptibility. Favorability models distinguish localities with environmental conditions that favor the species' existence from those with detrimental characteristics for its presence. We develop an index for assessing Potential Hunting Sustainability (PHS of each species based on their ecological characteristics (population density, habitat breadth, rarity and vulnerability, weighted according to restrictive and permissive assumptions of how species' characteristics are combined. Species are classified into five main hunting sustainability classes using fuzzy logic. Using the accumulated favorability values of all species, and their PHS values, we finally identify weak spots, defined as high diversity regions of especial hunting vulnerability for wildlife, as well as strong spots, defined as high diversity areas of high hunting sustainability potential. Our study uses relatively simple models that employ easily obtainable data of a species' ecological characteristics to assess the impacts of hunting in tropical regions. It provides information for management by charting the geography of where species are more or less likely to be at risk of extinction from hunting.
The Rasch Poisson counts model for incomplete data : An application of the EM algorithm
Jansen, G.G.H.
Rasch's Poisson counts model is a latent trait model for the situation in which K tests are administered to N examinees and the test score is a count [e.g., the repeated occurrence of some event, such as the number of items completed or the number of items answered (in)correctly]. The Rasch Poisson
Modeling Repeated Count Data : Some Extensions of the Rasch Poisson Counts Model
van Duijn, M.A.J.; Jansen, Margo
1995-01-01
We consider data that can be summarized as an N X K table of counts-for example, test data obtained by administering K tests to N subjects. The cell entries y(ij) are assumed to be conditionally independent Poisson-distributed random variables, given the NK Poisson intensity parameters mu(ij). The
Lord, Dominique; Geedipally, Srinivas Reddy; Guikema, Seth D
2010-08-01
The objective of this article is to evaluate the performance of the COM-Poisson GLM for analyzing crash data exhibiting underdispersion (when conditional on the mean). The COM-Poisson distribution, originally developed in 1962, has recently been reintroduced by statisticians for analyzing count data subjected to either over- or underdispersion. Over the last year, the COM-Poisson GLM has been evaluated in the context of crash data analysis and it has been shown that the model performs as well as the Poisson-gamma model for crash data exhibiting overdispersion. To accomplish the objective of this study, several COM-Poisson models were estimated using crash data collected at 162 railway-highway crossings in South Korea between 1998 and 2002. This data set has been shown to exhibit underdispersion when models linking crash data to various explanatory variables are estimated. The modeling results were compared to those produced from the Poisson and gamma probability models documented in a previous published study. The results of this research show that the COM-Poisson GLM can handle crash data when the modeling output shows signs of underdispersion. Finally, they also show that the model proposed in this study provides better statistical performance than the gamma probability and the traditional Poisson models, at least for this data set.
Dynamic Response of Non-Linear Inelsatic Systems to Poisson-Driven Stochastic Excitations
DEFF Research Database (Denmark)
Nielsen, Søren R. K.; Iwankiewicz, R.
A single-degree-of-freedom inelastic system subject to a stochastic excitation in form of a Poisson-distributed train of impulses is considered. The state variables of the system form a non-diffusive, Poisson-driven Markov process. Two approximate analytical techniques are developed: modification...
Characterizing the performance of the Conway-Maxwell Poisson generalized linear model.
Francis, Royce A; Geedipally, Srinivas Reddy; Guikema, Seth D; Dhavala, Soma Sekhar; Lord, Dominique; LaRocca, Sarah
2012-01-01
Count data are pervasive in many areas of risk analysis; deaths, adverse health outcomes, infrastructure system failures, and traffic accidents are all recorded as count events, for example. Risk analysts often wish to estimate the probability distribution for the number of discrete events as part of doing a risk assessment. Traditional count data regression models of the type often used in risk assessment for this problem suffer from limitations due to the assumed variance structure. A more flexible model based on the Conway-Maxwell Poisson (COM-Poisson) distribution was recently proposed, a model that has the potential to overcome the limitations of the traditional model. However, the statistical performance of this new model has not yet been fully characterized. This article assesses the performance of a maximum likelihood estimation method for fitting the COM-Poisson generalized linear model (GLM). The objectives of this article are to (1) characterize the parameter estimation accuracy of the MLE implementation of the COM-Poisson GLM, and (2) estimate the prediction accuracy of the COM-Poisson GLM using simulated data sets. The results of the study indicate that the COM-Poisson GLM is flexible enough to model under-, equi-, and overdispersed data sets with different sample mean values. The results also show that the COM-Poisson GLM yields accurate parameter estimates. The COM-Poisson GLM provides a promising and flexible approach for performing count data regression. © 2011 Society for Risk Analysis.
A relation between Liapunov stability, non-wanderingness and Poisson stability
International Nuclear Information System (INIS)
Ahmad, K.H.
1985-07-01
In this work, some of the relations among Liapunov stability, non-wanderingness and Poisson stability are considered. In particular it is shown that for a non-wandering point in a set, positive (resp. negative) Liapunov stability in that set implies positive (resp. negative) Poisson stability in the same set. (author)
Approximation by some combinations of Poisson integrals for Hermite and Laguerre expansions
Directory of Open Access Journals (Sweden)
Grażyna Krech
2013-02-01
Full Text Available The aim of this paper is the study of a rate of convergence of some combinations of Poisson integrals for Hermite and Laguerre expansions. We are able to achieve faster convergence for our modified operators over the Poisson integrals. We prove also the Voronovskaya type theorem for these new operators.
OML: optical maskless lithography for economic design prototyping and small-volume production
Sandstrom, Tor; Bleeker, Arno; Hintersteiner, Jason; Troost, Kars; Freyer, Jorge; van der Mast, Karel
2004-05-01
The business case for Maskless Lithography is more compelling than ever before, due to more critical processes, rising mask costs and shorter product cycles. The economics of Maskless Lithography gives a crossover volume from Maskless to mask-based lithography at surprisingly many wafers per mask for surprisingly few wafers per hour throughput. Also, small-volume production will in many cases be more economical with Maskless Lithography, even when compared to "shuttle" schemes, reticles with multiple layers, etc. The full benefit of Maskless Lithography is only achievable by duplicating processes that are compatible with volume production processes on conventional scanners. This can be accomplished by the integration of pattern generators based on spatial light modulator technology with state-of-the-art optical scanner systems. This paper reports on the system design of an Optical Maskless Scanner in development by ASML and Micronic: small-field optics with high demagnification, variable NA and illumination schemes, spatial light modulators with millions of MEMS mirrors on CMOS drivers, a data path with a sustained data flow of more than 250 GPixels per second, stitching of sub-fields to scanner fields, and rasterization and writing strategies for throughput and good image fidelity. Predicted lithographic performance based on image simulations is also shown.
Poisson's ratio and Young's modulus of lipid bilayers in different phases
Directory of Open Access Journals (Sweden)
Tayebeh eJadidi
2014-04-01
Full Text Available A general computational method is introduced to estimate the Poisson's ratio for membranes with small thickness.In this method, the Poisson's ratio is calculated by utilizing a rescaling of inter-particle distancesin one lateral direction under periodic boundary conditions. As an example for the coarse grained lipid model introduced by Lenz and Schmid, we calculate the Poisson's ratio in the gel, fluid, and interdigitated phases. Having the Poisson's ratio, enable us to obtain the Young's modulus for the membranes in different phases. The approach may be applied to other membranes such as graphene and tethered membranes in orderto predict the temperature dependence of its Poisson's ratio and Young's modulus.
The Lie-Poisson structure of integrable classical non-linear sigma models
International Nuclear Information System (INIS)
Bordemann, M.; Forger, M.; Schaeper, U.; Laartz, J.
1993-01-01
The canonical structure of classical non-linear sigma models on Riemannian symmetric spaces, which constitute the most general class of classical non-linear sigma models known to be integrable, is shown to be governed by a fundamental Poisson bracket relation that fits into the r-s-matrix formalism for non-ultralocal integrable models first discussed by Maillet. The matrices r and s are computed explicitly and, being field dependent, satisfy fundamental Poisson bracket relations of their own, which can be expressed in terms of a new numerical matrix c. It is proposed that all these Poisson brackets taken together are representation conditions for a new kind of algebra which, for this class of models, replaces the classical Yang-Baxter algebra governing the canonical structure of ultralocal models. The Poisson brackets for the transition matrices are also computed, and the notorious regularization problem associated with the definition of the Poisson brackets for the monodromy matrices is discussed. (orig.)
Cooperative HARQ with Poisson Interference and Opportunistic Routing
Kaveh, Mostafa
2014-01-06
This presentation considers reliable transmission of data from a source to a destination, aided cooperatively by wireless relays selected opportunistically and utilizing hybrid forward error correction/detection, and automatic repeat request (Hybrid ARQ, or HARQ). Specifically, we present a performance analysis of the cooperative HARQ protocol in a wireless adhoc multihop network employing spatial ALOHA. We model the nodes in such a network by a homogeneous 2-D Poisson point process. We study the tradeoff between the per-hop rate, spatial density and range of transmissions inherent in the network by optimizing the transport capacity with respect to the network design parameters, HARQ coding rate and medium access probability. We obtain an approximate analytic expression for the expected progress of opportunistic routing and optimize the capacity approximation by convex optimization. By way of numerical results, we show that the network design parameters obtained by optimizing the analytic approximation of transport capacity closely follows that of Monte Carlo based exact transport capacity optimization. As a result of the analysis, we argue that the optimal HARQ coding rate and medium access probability are independent of the node density in the network.
Confidence limits for parameters of Poisson and binomial distributions
International Nuclear Information System (INIS)
Arnett, L.M.
1976-04-01
The confidence limits for the frequency in a Poisson process and for the proportion of successes in a binomial process were calculated and tabulated for the situations in which the observed values of the frequency or proportion and an a priori distribution of these parameters are available. Methods are used that produce limits with exactly the stated confidence levels. The confidence interval [a,b] is calculated so that Pr [a less than or equal to lambda less than or equal to b c,μ], where c is the observed value of the parameter, and μ is the a priori hypothesis of the distribution of this parameter. A Bayesian type analysis is used. The intervals calculated are narrower and appreciably different from results, known to be conservative, that are often used in problems of this type. Pearson and Hartley recognized the characteristics of their methods and contemplated that exact methods could someday be used. The calculation of the exact intervals requires involved numerical analyses readily implemented only on digital computers not available to Pearson and Hartley. A Monte Carlo experiment was conducted to verify a selected interval from those calculated. This numerical experiment confirmed the results of the analytical methods and the prediction of Pearson and Hartley that their published tables give conservative results
Poisson process approximation for sequence repeats, and sequencing by hybridization.
Arratia, R; Martin, D; Reinert, G; Waterman, M S
1996-01-01
Sequencing by hybridization is a tool to determine a DNA sequence from the unordered list of all l-tuples contained in this sequence; typical numbers for l are l = 8, 10, 12. For theoretical purposes we assume that the multiset of all l-tuples is known. This multiset determines the DNA sequence uniquely if none of the so-called Ukkonen transformations are possible. These transformations require repeats of (l-1)-tuples in the sequence, with these repeats occurring in certain spatial patterns. We model DNA as an i.i.d. sequence. We first prove Poisson process approximations for the process of indicators of all leftmost long repeats allowing self-overlap and for the process of indicators of all left-most long repeats without self-overlap. Using the Chen-Stein method, we get bounds on the error of these approximations. As a corollary, we approximate the distribution of longest repeats. In the second step we analyze the spatial patterns of the repeats. Finally we combine these two steps to prove an approximation for the probability that a random sequence is uniquely recoverable from its list of l-tuples. For all our results we give some numerical examples including error bounds.
Downlink Non-Orthogonal Multiple Access (NOMA) in Poisson Networks
Ali, Konpal S.
2018-03-21
A network model is considered where Poisson distributed base stations transmit to $N$ power-domain non-orthogonal multiple access (NOMA) users (UEs) each that employ successive interference cancellation (SIC) for decoding. We propose three models for the clustering of NOMA UEs and consider two different ordering techniques for the NOMA UEs: mean signal power-based and instantaneous signal-to-intercell-interference-and-noise-ratio-based. For each technique, we present a signal-to-interference-and-noise ratio analysis for the coverage of the typical UE. We plot the rate region for the two-user case and show that neither ordering technique is consistently superior to the other. We propose two efficient algorithms for finding a feasible resource allocation that maximize the cell sum rate $\\\\mathcal{R}_{\\ m tot}$, for general $N$, constrained to: 1) a minimum rate $\\\\mathcal{T}$ for each UE, 2) identical rates for all UEs. We show the existence of: 1) an optimum $N$ that maximizes the constrained $\\\\mathcal{R}_{\\ m tot}$ given a set of network parameters, 2) a critical SIC level necessary for NOMA to outperform orthogonal multiple access. The results highlight the importance in choosing the network parameters $N$, the constraints, and the ordering technique to balance the $\\\\mathcal{R}_{\\ m tot}$ and fairness requirements. We also show that interference-aware UE clustering can significantly improve performance.
All-dry resist processes for 193-nm lithography
Horn, Mark W.; Maxwell, Brian E.; Kunz, Roderick R.; Hibbs, Michael S.; Eriksen, Lynn M.; Palmateer, Susan C.; Forte, Anthony R.
1995-06-01
We report on two different all-dry resist schemes for 193-nm lithography, one negative tone and one positive tone. Our negative tone resist is an extension of our initial work on all-dry photoresists. This scheme employs a bilayer in which the imaging layer is formed by plasma enhanced chemical vapor deposition (PECVD) from tetramethylsilane (TMS) and deposited onto PECVD carbon-based planarizing layers. Figure 1 shows SEMs of dark field and light field octagons patterned in projection on Lincoln Laboratory's 0.5-NA 193-nm Micrascan system. These 0.225-micrometers and 0.200-micrometers line and space features were obtained at a dose of approximately 58 mJ/cm2. Dry development of the exposed resist was accomplished using Cl2 chemistry in a helicon high-ion-density etching tool. Pattern transfer was performed in the helicon tool with oxygen-based chemistries. Recently, we have also developed an all-dry positive-tone silylation photoresist. This photoresist is a PECVD carbon-based polymer which is crosslinked by 193-nm exposure, enabling selective silylation similar to that initially reported by Hartney et al., with spin-applied polymers. In those polymers, for example polyvinylphenol, the silylation site concentration is fixed by the hydroxyl groups on the polymer precursors, thus limiting the silicon uptake per unit volume. With PECVD polymers, the total concentration of silylation sites and their depth can be tailored by varying plasma species as a function of time during the deposition. This affords the possibility of greater silicon uptake per unit volume and better depth control of the silylation profile. Figure 2 shows a SEM of 0.5-micrometers features patterned in plasma deposited silylation resist.
Fabrication of phosphor micro-grids using proton beam lithography
International Nuclear Information System (INIS)
Rossi, Paolo; Antolak, Arlyn J.; Provencio, Paula Polyak; Doyle, Barney Lee; Malmqvist, Klas; Hearne, Sean Joseph; Nilsson, Christer; Kristiansson, Per; Wegden, Marie; Elfman, Mikael; Pallon, Jan; Auzelyte, Vaida
2005-01-01
A new nuclear microscopy technique called ion photon emission microscopy or IPEM was recently invented. IPEM allows analysis involving single ions, such as ion beam induced charge (IBIC) or single event upset (SEU) imaging using a slightly modified optical microscope. The spatial resolution of IPEM is currently limited to more than 10 (micro)m by the scattering and reflection of ion-induced photons, i.e. light blooming or spreading, in the ionoluminescent phosphor layer. We are developing a 'Microscopic Gridded Phosphor' (also called Black Matrix) where the phosphor nanocrystals are confined within the gaps of a micrometer scale opaque grid, which limits the amount of detrimental light blooming. MeV-energy proton beam lithography is ideally suited to lithographically form masks for the grid because of high aspect ratio, pattern density and sub-micron resolution of this technique. In brief, the fabrication of the grids was made in the following manner: (1) a MeV proton beam focused to 1.5-2 (micro)m directly fabricated a matrix of pillars in a 15 (micro)m thick SU-8 lithographic resist; (2) 7:1 aspect ratio pillars were then formed by developing the proton exposed area; (3) Ni (Au) was electrochemically deposited onto Cu-coated Si from a sulfamate bath (or buffered CN bath); (4) the SU-8 pillars were removed by chemical etching; finally (5) the metal micro-grid was freed from its substrate by etching the underlying Cu layer. Our proposed metal micro-grids promise an order-of-magnitude improvement in the resolution of IPEM.
Applications of nanoimprint lithography/hot embossing: a review
Chen, Yifang
2015-11-01
This review concentrates on the applications of nanoimprint lithography (NIL) and hot embossing for the fabrications of nanolectronic devices, nanophotonic metamaterials and other nanostructures. Technical challenges and solutions in NIL such as nanofabrication of templates, removal of residual resist, pattern displacement in thermal NIL arising from thermal expansion are first discussed. In the nanofabrication of templates, dry etch in plasma for the formation of multi-step structures and ultra-sharp tip arrays in silicon, nanophotonic chiral structures with high aspect ratio in SiC are demonstrated. A bilayer technique for nondestructive removal of residual resist in thermal NIL is described. This process is successfully applied for the fabrication of T-shape gates and functional high electron mobility transistors. However, pattern displacement intrinsically existing in thermal NIL/hot embossing owing to different thermal expansions in the template and substrate, respectively, limits its further development and scale-up. Low temperature even room temperature NIL (RTNIL) was then proposed on HSQ, trying to eliminate the pattern distortion by avoiding a thermal loop in the imprint. But, considerable pressure needed in RTNIL turned the major attentions to the development of UV-curing NIL in UV-curable monomers at low temperature. A big variety of applications by low-temperature UV-curing NIL in SU-8 are described, including high-aspect-ratio phase gratings, tagging technology by nanobarcode for DNA sequencing, nanofluidic channels, nanophotonic metamaterials and biosensors. Hot embossing, as a parallel technique to NIL, was also developed, and its applications on ferroelectric polymers as well as metals are reviewed. Therefore, it is necessary to emphasize that this review is mainly attempted to review the applications of NIL/embossing instead of NIL technique advances.
Stop Flow Lithography Synthesis and Characterization of Structured Microparticles
Directory of Open Access Journals (Sweden)
David Baah
2014-01-01
Full Text Available In this study, the synthesis of nonspherical composite particles of poly(ethylene glycol diacrylate (PEG-DA/SiO2 and PEG-DA/Al2O3 with single or multiple vias and the corresponding inorganic particles of SiO2 and Al2O3 synthesized using the Stop Flow Lithography (SFL method is reported. Precursor suspensions of PEG-DA, 2-hydroxy-2-methylpropiophenone, and SiO2 or Al2O3 nanoparticles were prepared. The precursor suspension flows through a microfluidic device mounted on an upright microscope and is polymerized in an automated process. A patterned photomask with transparent geometric features masks UV light to synthesize the particles. Composite particles with vias were synthesized and corresponding inorganic SiO2 and Al2O3 particles were obtained through polymer burn-off and sintering of the composites. The synthesis of porous inorganic particles of SiO2 and Al2O3 with vias and overall dimensions in the range of ~35–90 µm was achieved. BET specific surface area measurements for single via inorganic particles were 56–69 m2/g for SiO2 particles and 73–81 m2/g for Al2O3 particles. Surface areas as high as 114 m2/g were measured for multivia cubic SiO2 particles. The findings suggest that, with optimization, the particles should have applications in areas where high surface area is important such as catalysis and sieving.
Low-defect reflective mask blanks for extreme ultraviolet lithography
International Nuclear Information System (INIS)
Burkhart, S C; Cerjarn, C; Kearney, P; Mirkarimi, P; Ray-Chaudhuri, A; Walton, C.
1999-01-01
Extreme Ultraviolet Lithgraphy (EUVL) is an emerging technology for fabrication of sub-100 nm feature sizes on silicon, following the SIA road map well into the 21st century. The specific EUVL system described is a scanned, projection lithography system with a 4:1 reduction, using a laser plasma EUV source. The mask and all of the system optics are reflective, multilayer mirrors which function in the extreme ultraviolet at 13.4 nm wavelength. Since the masks are imaged to the wafer exposure plane, mask defects greater than 80% of the exposure plane CD (for 4:1 reduction) will in many cases render the mask useless, whereas intervening optics can have defects which are not a printing problem. For the 100 nm node, we must reduce defects to less than 0.01/cm ampersand sup2; at sign 80nm or larger to obtain acceptable mask production yields. We have succeeded in reducing the defects to less than 0.1/cm ampersand sup2; for defects larger than 130 nm detected by visible light inspection tools, however our program goal is to achieve 0.01/cm ampersand sup2; in the near future. More importantly though, we plan to have a detailed understanding of defect origination and the effect on multilayer growth in order to mitigate defects below the 10 -2 /cm ampersand sup2; level on the next generation of mask blank deposition systems. In this paper we will discuss issues and results from the ion-beam multilayer deposition tool, details of the defect detection and characterization facility, and progress on defect printability modeling
Electron-beam-lithography (EBL)-engineered nanostructures for biosensing
Alexander, Troy A.; Wickenden, Alma E.
2004-12-01
Surface-Enhanced-Raman-Scattering (SERS) is potentially a very sensitive spectroscopic technique for the detection of biological agents (i.e., proteins, viruses or bacteria). However, since initial reports, its utility has not been realized. Its limited acceptance as a routine analysis technique for biological agents is largely due to the lack of reproducible SERS-active substrates. Most established SERS substrate fabrication schemes are based on self-assembly of the metallic (typically, Au, Ag, Pt, Pd or Cu) particles responsible for enhancement. Further, these protocols do not lend themselves to the stringent control over the enhancing feature shape, size, and placement on a nanometer scale. SERS can be made a more robust and attractive spectroscopic technique for biological agents by developing quantifiable, highly sensitive, and highly selective SERS-active substrates. Electron Beam Lithography (EBL), a semiconductor fabrication technique, can be utilized to address many of the obstacles which have limited the broad acceptance of SERS. Specifically, EBL can be employed to precisely control the shape, size and position (on a nanometer scale) of the SERS substrate enhancing features. Since Ashkin's seminal work in the early 1970s, the optical trapping phenomenon has been broadly accepted as a powerful tool to study micrometer-scale biological particles. Recently, research in our laboratory has demonstrated that it is possible to combine the Optical Trapping phenomenon and SERS to develop a high sensitivity spectroscopic technique for the detection of individual bacterial spores. Highly reproducible SERS-active substrates fabricated using EBL have been utilized with this novel spectroscopic technique to investigate the utility of SERS technique for the spectral discrimination of bacterial spores. The SERS substrate fabrication methodology, substrate reproducibility and SERS spectral reproducibility will be discussed.
Hot spots of mutualistic networks.
Gilarranz, Luis J; Sabatino, Malena; Aizen, Marcelo A; Bascompte, Jordi
2015-03-01
Incorporating interactions into a biogeographical framework may serve to understand how interactions and the services they provide are distributed in space. We begin by simulating the spatiotemporal dynamics of realistic mutualistic networks inhabiting spatial networks of habitat patches. We proceed by comparing the predicted patterns with the empirical results of a set of pollination networks in isolated hills of the Argentinian Pampas. We first find that one needs to sample up to five times as much area to record interactions as would be needed to sample the same proportion of species. Secondly, we find that peripheral patches have fewer interactions and harbour less nested networks - therefore potentially less resilient communities - compared to central patches. Our results highlight the important role played by the structure of dispersal routes on the spatial distribution of community patterns. This may help to understand the formation of biodiversity hot spots. © 2014 The Authors. Journal of Animal Ecology © 2014 British Ecological Society.
Cosmicflows-3: Cold Spot Repeller?
Energy Technology Data Exchange (ETDEWEB)
Courtois, Hélène M.; Graziani, Romain; Dupuy, Alexandra [University of Lyon, UCB Lyon 1, CNRS/IN2P3, IPN, Lyon (France); Tully, R. Brent [Institute for Astronomy, University of Hawaii, 2680 Woodlawn Drive, Honolulu, HI 96822 (United States); Hoffman, Yehuda [Racah Institute of Physics, Hebrew University, Jerusalem, 91904 (Israel); Pomarède, Daniel [Institut de Recherche sur les Lois Fondamentales de l’Univers, CEA, Université Paris-Saclay, F-91191 Gif-sur-Yvette (France)
2017-09-20
The three-dimensional gravitational velocity field within z ∼ 0.1 has been modeled with the Wiener filter methodology applied to the Cosmicflows-3 compilation of galaxy distances. The dominant features are a basin of attraction and two basins of repulsion. The major basin of attraction is an extension of the Shapley concentration of galaxies. One basin of repulsion, the Dipole Repeller, is located near the anti-apex of the cosmic microwave background dipole. The other basin of repulsion is in the proximate direction toward the “Cold Spot” irregularity in the cosmic microwave background. It has been speculated that a vast void might contribute to the amplitude of the Cold Spot from the integrated Sachs–Wolfe effect.
Indus-2 X-ray lithography beamline for X-ray optics and material science applications
Dhamgaye, V. P.; Lodha, G. S.
2014-04-01
X-ray lithography is an ideal technique by which high aspect ratio and high spatial resolution micro/nano structures are fabricated using X-rays from synchrotron radiation source. The technique has been used for fabricating optics (X-ray, visible and infrared), sensors and actuators, fluidics and photonics. A beamline for X-ray lithography is operational on Indus-2. The beamline offers wide lithographic window from 1-40keV photon energy and wide beam for producing microstructures in polymers upto size ˜100mm × 100mm. X-ray exposures are possible in air, vacuum and He gas environment. The air based exposures enables the X-ray irradiation of resist for lithography and also irradiation of biological and liquid samples.
Dynamics of radical ions of fluorinated polymer for Extreme Ultraviolet (EUV) lithography
Nomura, Naoya; Okamoto, Kazumasa; Yamamoto, Hiroki; Kozawa, Takahiro; Fujiyoshi, Ryoko; Umegaki, Kikuo
2015-07-01
To realize extreme ultraviolet (EUV) lithography for mass production of semiconductor devices, enhancements of performance of chemically amplified resist have been still important issue. In EUV resist, radiation chemical reactions occur after irradiations of the EUV light. Dynamics of chemical intermediates of EUV resist after exposure to the ionizing radiations is important for understanding new resist design. Fluorinated resists have been developed for ArF, F2, and EUV lithography. Fluorinated polymers are effective to enhance the sensitivity of the EUV resist because F atom has higher absorptivity of EUV photons. However, the fluorination effect on the radiation chemical reactions in the resist has not been clarified in detail. In this study, we investigated the dynamics of radical ions of fluorinated polymers (FPs) by pulse radiolysis method and quantum chemical calculations to clarify the reaction mechanism for EUV lithography.
Planar self-aligned imprint lithography for coplanar plasmonic nanostructures fabrication
Wan, Weiwei
2014-03-01
Nanoimprint lithography (NIL) is a cost-efficient nanopatterning technology because of its promising advantages of high throughput and high resolution. However, accurate multilevel overlay capability of NIL required for integrated circuit manufacturing remains a challenge due to the high cost of achieving mechanical alignment precision. Although self-aligned imprint lithography was developed to avoid the need of alignment for the vertical layered structures, it has limited usage in the manufacture of the coplanar structures, such as integrated plasmonic devices. In this paper, we develop a new process of planar self-alignment imprint lithography (P-SAIL) to fabricate the metallic and dielectric structures on the same plane. P-SAIL transfers the multilevel imprint processes to a single-imprint process which offers higher efficiency and less cost than existing manufacturing methods. Such concept is demonstrated in an example of fabricating planar plasmonic structures consisting of different materials. © 2014 Springer-Verlag Berlin Heidelberg.
Integration of multiple theories for the simulation of laser interference lithography processes
Lin, Te-Hsun; Yang, Yin-Kuang; Fu, Chien-Chung
2017-11-01
The periodic structure of laser interference lithography (LIL) fabrication is superior to other lithography technologies. In contrast to traditional lithography, LIL has the advantages of being a simple optical system with no mask requirements, low cost, high depth of focus, and large patterning area in a single exposure. Generally, a simulation pattern for the periodic structure is obtained through optical interference prior to its fabrication through LIL. However, the LIL process is complex and combines the fields of optical and polymer materials; thus, a single simulation theory cannot reflect the real situation. Therefore, this research integrates multiple theories, including those of optical interference, standing waves, and photoresist characteristics, to create a mathematical model for the LIL process. The mathematical model can accurately estimate the exposure time and reduce the LIL process duration through trial and error.
Synchrotron radiation sources and condensers for projection x-ray lithography
International Nuclear Information System (INIS)
Murphy, J.B.; MacDowell, A.A.; White, D.L.; Wood, O.R. II
1992-01-01
The design requirements for a compact electron storage ring that could be used as a soft x-ray source for projection lithography are discussed. The design concepts of the x-ray optics that are required to collect and condition the radiation in divergence, uniformity and direction to properly illuminate the mask and the particular x-ray projection camera used are discussed. Preliminary designs for an entire soft x-ray projection lithography system using an electron storage ring as a soft X-ray source are presented. It is shown that by combining the existing technology of storage rings with large collection angle condensers, a powerful and reliable source of 130 Angstrom photons for production line projection x-ray lithography is possible
Report of the second workshop on synchrotron radiation sources for x-ray lithography
Energy Technology Data Exchange (ETDEWEB)
Barton, M.Q.; Craft, B.; Williams, G.P. (eds.)
1986-01-01
The reported workshop is part of an effort to implement a US-based x-ray lithography program. Presentations include designs for three storage rings (one superconducting and two conventional) and an overview of a complete lithography program. The background of the effort described, the need for synchrotron radiation, and the international competition in the area are discussed briefly. The technical feasibility of x-ray lithography is discussed, and synchrotron performance specifications and construction options are given, as well as a near-term plan. It is recommended that a prototype synchrotron source be built as soon as possible, and that a research and development plan on critical technologies which could improve cost effectiveness of the synchrotron source be established. It is further recommended that a small number of second generation prototype synchrotrons be distributed to IC manufacturing centers to expedite commercialization. (LEW)
DWDM laser arrays fabricated using thermal nanoimprint lithography on Indium Phosphide substrates
DEFF Research Database (Denmark)
Smistrup, K.; Nørregaard, J.; Mironov, A.
2013-01-01
by including a lambda quarter shift at the center of the grating. The need for phase shifts and multiple wavelengths eliminates some lithography methods such as holography. Typically, these lasers are produced by e-beam lithography (EBL). We present a production method based on thermal nanoimprint lithography...... (T-NIL), which is potentially less costly and faster than EBL. NIL Technology and NeoPhotonics designed a stamp with the structures shown in Figure 1. The stamp was fabricated using EBL and dry etching. The line width on the stamp was 40 nm to accommodate for line broadening in subsequent processing....... The fabricated lasers were cleaved and measured. Laser arrays exhibited >40mW optical power in all 12 channels. Figure 3 shows the overlaid spectra of a 12-channel array laser chip with uniform (~3nm) wavelength spacing and good sidemode suppression....
Report of the second workshop on synchrotron radiation sources for x-ray lithography
International Nuclear Information System (INIS)
Barton, M.Q.; Craft, B.; Williams, G.P.
1986-01-01
The reported workshop is part of an effort to implement a US-based x-ray lithography program. Presentations include designs for three storage rings (one superconducting and two conventional) and an overview of a complete lithography program. The background of the effort described, the need for synchrotron radiation, and the international competition in the area are discussed briefly. The technical feasibility of x-ray lithography is discussed, and synchrotron performance specifications and construction options are given, as well as a near-term plan. It is recommended that a prototype synchrotron source be built as soon as possible, and that a research and development plan on critical technologies which could improve cost effectiveness of the synchrotron source be established. It is further recommended that a small number of second generation prototype synchrotrons be distributed to IC manufacturing centers to expedite commercialization
Investigation of Glass Polycapillaries for Use in Proximity X-Ray Lithography.
Klotzko, Ira L.
There is predicted growth of the micro-electronics industry in the 1990's and into the early 21^{st} century. In order for manufacturers of IC's to stay competitive in this vast global market, devices will have to be faster, more sophisticated, and more capable. According to the National Technology Roadmap for Semiconductors by The Semiconductor Industry Association (SIA), feature sizes in device structures are required to decrease in size in order for these goals to be realized. Presently, manufacturers use lithography with deep-ultra-violet (DUV) ^{1,2} wavelengths to produce circuit features of 0.30 μm and below. Because the wavelength of radiation used is of the same size as the features, diffraction phenomenon has become a limiting factor. Industry must therefore choose a new lithographic technique that can overcome the difficulties caused by these relatively large wavelengths. Although, some techniques have the ability to produce feature sizes of 0.2 μm and below, such as electron -beam lithography, ion-beam lithography, synchrotron-x-ray lithography, and even some optical techniques, they have not all developed an economically feasible method of mass producing device structures with a variety of geometries ^{3,4,5}. One such technique, point source x-ray lithography (PXRL), using considerably smaller wavelengths than those used by the current state of the art, could assist optical lithography in economically producing future generations of IC's. The characteristics of an x-ray field needed for x-ray lithography (XRL) is critically important to the manufacturing process. The beam must have control over the divergences produced by the finite-wafer-mask distance and the finite source size, the dose must be uniform throughout the field of exposure, the wavelength must be such as to prevent device damage and to maximize the interaction with the photo-resist, and there must be enough intensity to minimize exposure time. Point-source-x-ray-lithography system
Integration of multiple theories for the simulation of laser interference lithography processes.
Lin, Te-Hsun; Yang, Yin-Kuang; Fu, Chien-Chung
2017-11-24
The periodic structure of laser interference lithography (LIL) fabrication is superior to other lithography technologies. In contrast to traditional lithography, LIL has the advantages of being a simple optical system with no mask requirements, low cost, high depth of focus, and large patterning area in a single exposure. Generally, a simulation pattern for the periodic structure is obtained through optical interference prior to its fabrication through LIL. However, the LIL process is complex and combines the fields of optical and polymer materials; thus, a single simulation theory cannot reflect the real situation. Therefore, this research integrates multiple theories, including those of optical interference, standing waves, and photoresist characteristics, to create a mathematical model for the LIL process. The mathematical model can accurately estimate the exposure time and reduce the LIL process duration through trial and error.
Hot Spot Removal System: System description
International Nuclear Information System (INIS)
1997-09-01
Hazardous wastes contaminated with radionuclides, chemicals, and explosives exist across the Department of Energy complex and need to be remediated due to environmental concerns. Currently, an opportunity is being developed to dramatically reduce remediation costs and to assist in the acceleration of schedules associated with these wastes by deploying a Hot Spot Removal System. Removing the hot spot from the waste site will remove risk driver(s) and enable another, more cost effective process/option/remedial alternative (i.e., capping) to be applied to the remainder of the site. The Hot Spot Removal System consists of a suite of technologies that will be utilized to locate and remove source terms. Components of the system can also be used in a variety of other cleanup activities. This Hot Spot Removal System Description document presents technologies that were considered for possible inclusion in the Hot Spot Removal System, technologies made available to the Hot Spot Removal System, industrial interest in the Hot Spot Removal System''s subsystems, the schedule required for the Hot Spot Removal System, the evaluation of the relevant technologies, and the recommendations for equipment and technologies as stated in the Plan section
7 CFR 28.415 - Low Middling Light Spotted Color.
2010-01-01
... 7 Agriculture 2 2010-01-01 2010-01-01 false Low Middling Light Spotted Color. 28.415 Section 28... Spotted Color. Low Middling Light Spotted Color is color which in spot or color, or both, is between Low Middling Color and Low Middling Spotted Color. ...
7 CFR 28.411 - Good Middling Light Spotted Color.
2010-01-01
... 7 Agriculture 2 2010-01-01 2010-01-01 false Good Middling Light Spotted Color. 28.411 Section 28... Light Spotted Color. Good Middling Light Spotted Color is color which in spot or color, or both, is between Good Middling Color and Good Middling Spotted Color. ...
7 CFR 28.413 - Middling Light Spotted Color.
2010-01-01
... 7 Agriculture 2 2010-01-01 2010-01-01 false Middling Light Spotted Color. 28.413 Section 28.413... Spotted Color. Middling Light Spotted Color is color which in spot or color, or both, is between Middling Color and Middling Spotted Color. ...
7 CFR 28.412 - Strict Middling Light Spotted Color.
2010-01-01
... 7 Agriculture 2 2010-01-01 2010-01-01 false Strict Middling Light Spotted Color. 28.412 Section 28... Light Spotted Color. Strict Middling Light Spotted Color is color which in spot or color, or both, is between Strict Middling Color and Strict Middling Spotted Color. ...
A low cost high resolution pattern generator for electron-beam lithography
International Nuclear Information System (INIS)
Pennelli, G.; D'Angelo, F.; Piotto, M.; Barillaro, G.; Pellegrini, B.
2003-01-01
A simple, very low cost pattern generator for electron-beam lithography is presented. When it is applied to a scanning electron microscope, the system allows a high precision positioning of the beam for lithography of very small structures. Patterns are generated by a suitable software implemented on a personal computer, by using very simple functions, allowing an easy development of new writing strategies for a great adaptability to different user necessities. Hardware solutions, as optocouplers and battery supply, have been implemented for reduction of noise and disturbs on the voltages controlling the positioning of the beam
Sub-Rayleigh lithography using high flux loss-resistant entangled states of light.
Rosen, Shamir; Afek, Itai; Israel, Yonatan; Ambar, Oron; Silberberg, Yaron
2012-09-07
Quantum lithography achieves phase superresolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable with reduced use of quantum resources and, consequently, enhanced resistance to loss. The scheme is an implementation of interferometric lithography using a mixture of a spontaneous parametric down-converted entangled state with intense classical coherent light. We measure coincidences of up to four photons mimicking multiphoton absorption. The results show a narrowing of the interference fringes of up to 30% with respect to the best analogous classical scheme using only 10% of the nonclassical light required for creating NOON states.
DEFF Research Database (Denmark)
Bu, Ian Y. Y.; Eichhorn, Volkmar; Carlson, Kenneth
2011-01-01
Carbon nanotube (CNT) arrays are typically defined by electron beam lithography (EBL), and hence limited to small areas due to the low throughput. To obtain wafer‐scale fabrication we propose large area thermal nanoimprint lithography (NIL). A 2‐inch stamp master is defined using EBL for subsequent......, efficient production of wafer‐scale/larger arrays of CNTs has been achieved. The CNTs have been deposited by wafer‐scale plasma enhanced chemical vapour deposition (PECVD) of C2H2/NH3. Substrates containing such nanotubes have been used to automate nanorobotic manipulation sequences of individual CNTs...
Shaped e-beam lithography integration work for advanced ASIC manufacturing: progress report
Pain, Laurent; Charpin, Murielle; LaPlanche, Yves; Henry, Daniel
2002-07-01
For the sub-90 nm node integrated circuits design rules, ITRS forecasts require minimal gate line width down to 55-35 nm. To reach such aggressive targets, most advanced optical lithography tools combined with all reticle enhancement techniques will be requested inducing important manufacturing cost and mask cycle time increase. In order to address prototyping market and reduce fabrication cost, shaped electron beam lithography may represent a technological alternative for cost reduction due to its high resolution and potential throughput capabilities. This paper is focused on the integration of this technology in standard ASIC plant, including resist process and overlay capabilities.
Directory of Open Access Journals (Sweden)
Kim Ki Seok
2011-01-01
Full Text Available Abstract We have demonstrated simultaneous fabrication of designed defects within a periodic structure. For rapid fabrication of periodic structures incorporating nanoscale line-defects at large area, topographically assisted holographic lithography (TAHL technique, combining the strength of hologram lithography and phase-shift interference, was proposed. Hot-embossing method generated the photoresist patterns with vertical side walls which enabled phase-shift mask effect at the edge of patterns. Embossing temperature and relief height were crucial parameters for the successful TAHL process. Periodic holes with a diameter of 600 nm at a 1 μm-pitch incorporating 250 nm wide line-defects were obtained simultaneously.
Electroneutral models for dynamic Poisson-Nernst-Planck systems
Song, Zilong; Cao, Xiulei; Huang, Huaxiong
2018-01-01
The Poisson-Nernst-Planck (PNP) system is a standard model for describing ion transport. In many applications, e.g., ions in biological tissues, the presence of thin boundary layers poses both modeling and computational challenges. In this paper, we derive simplified electroneutral (EN) models where the thin boundary layers are replaced by effective boundary conditions. There are two major advantages of EN models. First, it is much cheaper to solve them numerically. Second, EN models are easier to deal with compared to the original PNP system; therefore, it would also be easier to derive macroscopic models for cellular structures using EN models. Even though the approach used here is applicable to higher-dimensional cases, this paper mainly focuses on the one-dimensional system, including the general multi-ion case. Using systematic asymptotic analysis, we derive a variety of effective boundary conditions directly applicable to the EN system for the bulk region. This EN system can be solved directly and efficiently without computing the solution in the boundary layer. The derivation is based on matched asymptotics, and the key idea is to bring back higher-order contributions into the effective boundary conditions. For Dirichlet boundary conditions, the higher-order terms can be neglected and the classical results (continuity of electrochemical potential) are recovered. For flux boundary conditions, higher-order terms account for the accumulation of ions in boundary layer and neglecting them leads to physically incorrect solutions. To validate the EN model, numerical computations are carried out for several examples. Our results show that solving the EN model is much more efficient than the original PNP system. Implemented with the Hodgkin-Huxley model, the computational time for solving the EN model is significantly reduced without sacrificing the accuracy of the solution due to the fact that it allows for relatively large mesh and time-step sizes.
Incompressible SPH (ISPH) with fast Poisson solver on a GPU
Chow, Alex D.; Rogers, Benedict D.; Lind, Steven J.; Stansby, Peter K.
2018-05-01
This paper presents a fast incompressible SPH (ISPH) solver implemented to run entirely on a graphics processing unit (GPU) capable of simulating several millions of particles in three dimensions on a single GPU. The ISPH algorithm is implemented by converting the highly optimised open-source weakly-compressible SPH (WCSPH) code DualSPHysics to run ISPH on the GPU, combining it with the open-source linear algebra library ViennaCL for fast solutions of the pressure Poisson equation (PPE). Several challenges are addressed with this research: constructing a PPE matrix every timestep on the GPU for moving particles, optimising the limited GPU memory, and exploiting fast matrix solvers. The ISPH pressure projection algorithm is implemented as 4 separate stages, each with a particle sweep, including an algorithm for the population of the PPE matrix suitable for the GPU, and mixed precision storage methods. An accurate and robust ISPH boundary condition ideal for parallel processing is also established by adapting an existing WCSPH boundary condition for ISPH. A variety of validation cases are presented: an impulsively started plate, incompressible flow around a moving square in a box, and dambreaks (2-D and 3-D) which demonstrate the accuracy, flexibility, and speed of the methodology. Fragmentation of the free surface is shown to influence the performance of matrix preconditioners and therefore the PPE matrix solution time. The Jacobi preconditioner demonstrates robustness and reliability in the presence of fragmented flows. For a dambreak simulation, GPU speed ups demonstrate up to 10-18 times and 1.1-4.5 times compared to single-threaded and 16-threaded CPU run times respectively.
Amalia, Junita; Purhadi, Otok, Bambang Widjanarko
2017-11-01
Poisson distribution is a discrete distribution with count data as the random variables and it has one parameter defines both mean and variance. Poisson regression assumes mean and variance should be same (equidispersion). Nonetheless, some case of the count data unsatisfied this assumption because variance exceeds mean (over-dispersion). The ignorance of over-dispersion causes underestimates in standard error. Furthermore, it causes incorrect decision in the statistical test. Previously, paired count data has a correlation and it has bivariate Poisson distribution. If there is over-dispersion, modeling paired count data is not sufficient with simple bivariate Poisson regression. Bivariate Poisson Inverse Gaussian Regression (BPIGR) model is mix Poisson regression for modeling paired count data within over-dispersion. BPIGR model produces a global model for all locations. In another hand, each location has different geographic conditions, social, cultural and economic so that Geographically Weighted Regression (GWR) is needed. The weighting function of each location in GWR generates a different local model. Geographically Weighted Bivariate Poisson Inverse Gaussian Regression (GWBPIGR) model is used to solve over-dispersion and to generate local models. Parameter estimation of GWBPIGR model obtained by Maximum Likelihood Estimation (MLE) method. Meanwhile, hypothesis testing of GWBPIGR model acquired by Maximum Likelihood Ratio Test (MLRT) method.
Soft network materials with isotropic negative Poisson's ratios over large strains.
Liu, Jianxing; Zhang, Yihui
2018-01-31
Auxetic materials with negative Poisson's ratios have important applications across a broad range of engineering areas, such as biomedical devices, aerospace engineering and automotive engineering. A variety of design strategies have been developed to achieve artificial auxetic materials with controllable responses in the Poisson's ratio. The development of designs that can offer isotropic negative Poisson's ratios over large strains can open up new opportunities in emerging biomedical applications, which, however, remains a challenge. Here, we introduce deterministic routes to soft architected materials that can be tailored precisely to yield the values of Poisson's ratio in the range from -1 to 1, in an isotropic manner, with a tunable strain range from 0% to ∼90%. The designs rely on a network construction in a periodic lattice topology, which incorporates zigzag microstructures as building blocks to connect lattice nodes. Combined experimental and theoretical studies on broad classes of network topologies illustrate the wide-ranging utility of these concepts. Quantitative mechanics modeling under both infinitesimal and finite deformations allows the development of a rigorous design algorithm that determines the necessary network geometries to yield target Poisson ratios over desired strain ranges. Demonstrative examples in artificial skin with both the negative Poisson's ratio and the nonlinear stress-strain curve precisely matching those of the cat's skin and in unusual cylindrical structures with engineered Poisson effect and shape memory effect suggest potential applications of these network materials.
Poplová, Michaela; Sovka, Pavel; Cifra, Michal
2017-01-01
Photonic signals are broadly exploited in communication and sensing and they typically exhibit Poisson-like statistics. In a common scenario where the intensity of the photonic signals is low and one needs to remove a nonstationary trend of the signals for any further analysis, one faces an obstacle: due to the dependence between the mean and variance typical for a Poisson-like process, information about the trend remains in the variance even after the trend has been subtracted, possibly yielding artifactual results in further analyses. Commonly available detrending or normalizing methods cannot cope with this issue. To alleviate this issue we developed a suitable pre-processing method for the signals that originate from a Poisson-like process. In this paper, a Poisson pre-processing method for nonstationary time series with Poisson distribution is developed and tested on computer-generated model data and experimental data of chemiluminescence from human neutrophils and mung seeds. The presented method transforms a nonstationary Poisson signal into a stationary signal with a Poisson distribution while preserving the type of photocount distribution and phase-space structure of the signal. The importance of the suggested pre-processing method is shown in Fano factor and Hurst exponent analysis of both computer-generated model signals and experimental photonic signals. It is demonstrated that our pre-processing method is superior to standard detrending-based methods whenever further signal analysis is sensitive to variance of the signal.
Conditional Poisson models: a flexible alternative to conditional logistic case cross-over analysis.
Armstrong, Ben G; Gasparrini, Antonio; Tobias, Aurelio
2014-11-24
The time stratified case cross-over approach is a popular alternative to conventional time series regression for analysing associations between time series of environmental exposures (air pollution, weather) and counts of health outcomes. These are almost always analyzed using conditional logistic regression on data expanded to case-control (case crossover) format, but this has some limitations. In particular adjusting for overdispersion and auto-correlation in the counts is not possible. It has been established that a Poisson model for counts with stratum indicators gives identical estimates to those from conditional logistic regression and does not have these limitations, but it is little used, probably because of the overheads in estimating many stratum parameters. The conditional Poisson model avoids estimating stratum parameters by conditioning on the total event count in each stratum, thus simplifying the computing and increasing the number of strata for which fitting is feasible compared with the standard unconditional Poisson model. Unlike the conditional logistic model, the conditional Poisson model does not require expanding the data, and can adjust for overdispersion and auto-correlation. It is available in Stata, R, and other packages. By applying to some real data and using simulations, we demonstrate that conditional Poisson models were simpler to code and shorter to run than are conditional logistic analyses and can be fitted to larger data sets than possible with standard Poisson models. Allowing for overdispersion or autocorrelation was possible with the conditional Poisson model but when not required this model gave identical estimates to those from conditional logistic regression. Conditional Poisson regression models provide an alternative to case crossover analysis of stratified time series data with some advantages. The conditional Poisson model can also be used in other contexts in which primary control for confounding is by fine
[Application of detecting and taking overdispersion into account in Poisson regression model].
Bouche, G; Lepage, B; Migeot, V; Ingrand, P
2009-08-01
Researchers often use the Poisson regression model to analyze count data. Overdispersion can occur when a Poisson regression model is used, resulting in an underestimation of variance of the regression model parameters. Our objective was to take overdispersion into account and assess its impact with an illustration based on the data of a study investigating the relationship between use of the Internet to seek health information and number of primary care consultations. Three methods, overdispersed Poisson, a robust estimator, and negative binomial regression, were performed to take overdispersion into account in explaining variation in the number (Y) of primary care consultations. We tested overdispersion in the Poisson regression model using the ratio of the sum of Pearson residuals over the number of degrees of freedom (chi(2)/df). We then fitted the three models and compared parameter estimation to the estimations given by Poisson regression model. Variance of the number of primary care consultations (Var[Y]=21.03) was greater than the mean (E[Y]=5.93) and the chi(2)/df ratio was 3.26, which confirmed overdispersion. Standard errors of the parameters varied greatly between the Poisson regression model and the three other regression models. Interpretation of estimates from two variables (using the Internet to seek health information and single parent family) would have changed according to the model retained, with significant levels of 0.06 and 0.002 (Poisson), 0.29 and 0.09 (overdispersed Poisson), 0.29 and 0.13 (use of a robust estimator) and 0.45 and 0.13 (negative binomial) respectively. Different methods exist to solve the problem of underestimating variance in the Poisson regression model when overdispersion is present. The negative binomial regression model seems to be particularly accurate because of its theorical distribution ; in addition this regression is easy to perform with ordinary statistical software packages.
Application of the Hyper-Poisson Generalized Linear Model for Analyzing Motor Vehicle Crashes.
Khazraee, S Hadi; Sáez-Castillo, Antonio Jose; Geedipally, Srinivas Reddy; Lord, Dominique
2015-05-01
The hyper-Poisson distribution can handle both over- and underdispersion, and its generalized linear model formulation allows the dispersion of the distribution to be observation-specific and dependent on model covariates. This study's objective is to examine the potential applicability of a newly proposed generalized linear model framework for the hyper-Poisson distribution in analyzing motor vehicle crash count data. The hyper-Poisson generalized linear model was first fitted to intersection crash data from Toronto, characterized by overdispersion, and then to crash data from railway-highway crossings in Korea, characterized by underdispersion. The results of this study are promising. When fitted to the Toronto data set, the goodness-of-fit measures indicated that the hyper-Poisson model with a variable dispersion parameter provided a statistical fit as good as the traditional negative binomial model. The hyper-Poisson model was also successful in handling the underdispersed data from Korea; the model performed as well as the gamma probability model and the Conway-Maxwell-Poisson model previously developed for the same data set. The advantages of the hyper-Poisson model studied in this article are noteworthy. Unlike the negative binomial model, which has difficulties in handling underdispersed data, the hyper-Poisson model can handle both over- and underdispersed crash data. Although not a major issue for the Conway-Maxwell-Poisson model, the effect of each variable on the expected mean of crashes is easily interpretable in the case of this new model. © 2014 Society for Risk Analysis.
Extreme ultraviolet lithography: A few more pieces of the puzzle
Energy Technology Data Exchange (ETDEWEB)
Anderson, Christopher N. [Univ. of California, Berkeley, CA (United States)
2009-05-20
The work described in this dissertation has improved three essential components of extreme ultraviolet (EUV) lithography: exposure tools, photoresist, and metrology. Exposure tools. A field-averaging illumination stage is presented that enables nonuniform, high-coherence sources to be used in applications where highly uniform illumination is required. In an EUV implementation, it is shown that the illuminator achieves a 6.5% peak-to-valley intensity variation across the entire design field of view. In addition, a design for a stand-alone EUV printing tool capable of delivering 15 nm half-pitch sinusoidal fringes with available sources, gratings and nano-positioning stages is presented. It is shown that the proposed design delivers a near zero line-edge-rougness (LER) aerial image, something extremely attractive for the application of resist testing. Photoresist. Two new methods of quantifying the deprotection blur of EUV photoresists are described and experimentally demonstrated. The deprotection blur, LER, and sensitivity parameters of several EUV photoresists are quantified simultaneously as base weight percent, photoacid generator (PAG) weight percent, and post-exposure bake (PEB) temperature are varied. Two surprising results are found: (1) changing base weight percent does not significantly affect the deprotection blur of EUV photoresist, and (2) increasing PAG weight percent can simultaneously reduce LER and E-size in EUV photoresist. The latter result motivates the development of an EUV exposure statistics model that includes the effects of photon shot noise, the PAG spatial distribution, and the changing of the PAG distribution during the exposure. In addition, a shot noise + deprotection blur model is used to show that as deprotection blur becomes large relative to the size of the printed feature, LER reduction from improved counting statistics becomes dominated by an increase in LER due to reduced deprotection contrast. Metrology. Finally, this
Discharge plasmas as EUV Sources for Future Micro Lithography
Kruecken, Thomas
2007-08-01
Future extreme ultraviolet (EUV) lithography will require very high radiation intensities in a narrow wavelength range around 13.5 nm, which is most efficiently emitted as line radiation by highly ionized heavy particles. Currently the most intense EUV sources are based on xenon or tin gas discharges. After having investigated the limits of a hollow cathode triggered xenon pinch discharge Philips Extreme UV favors a laser triggered tin vacuum spark discharge. Plasma and radiation properties of these highly transient discharges will be compared. Besides simple MHD-models the ADAS software package has been used to generate important atomic and spectral data of the relevant ion stages. To compute excitation and radiation properties, collisional radiative equilibria of individual ion stages are computed. For many lines opacity effects cannot be neglected. In the xenon discharges the optical depths allow for a treatment based on escape factors. Due to the rapid change of plasma parameters the abundancies of the different ionization stages must be computed dynamically. This requires effective ionization and recombination rates, which can also be supplied by ADAS. Due to very steep gradients (up to a couple orders of magnitude per mm) the plasma of tin vacuum spark discharges is very complicated. Therefore we shall describe here only some technological aspects of our tin EUV lamp: The electrode system consists of two rotating which are pulled through baths of molten tin such that a tin film remains on their surfaces. With a laser pulse some tin is ablated from one of the wheels and travels rapidly through vacuum towards the other rotating wheel. When the tin plasma reaches the other electrodes it ignites and the high current phase starts, i.e. the capacitor bank is unloaded, the plasma is pinched and EUV is radiated. Besides the good spectral properties of tin this concept has some other advantages: Erosion of electrodes is no severe problem as the tin film is
Control Multivariante Estadístico de Variables Discretas tipo Poisson
GARCIA BUSTOS, SANDRA LORENA
2016-01-01
En algunos casos, cuando el número de defectos de un proceso de producción tiene que ser controlada, la distribución de Poisson se emplea para modelar la frecuencia de estos defectos y para desarrollar un gráfico de control. En este trabajo se analiza el control de características de calidad p> 1 de Poisson . Cuando este control se necesita, hay dos enfoques principales: 1 - Un gráfico para cada variable de Poisson, el esquema múltiple.. 2 -. Sólo una gráfico para todas las variables, el sist...
Hamiltonian field description of the one-dimensional Poisson-Vlasov equations
International Nuclear Information System (INIS)
Morrison, P.J.
1981-07-01
The one-dimensional Poisson-Vlasov equations are cast into Hamiltonian form. A Poisson Bracket in terms of the phase space density, as sole dynamical variable, is presented. This Poisson bracket is not of the usual form, but possesses the commutator properties of antisymmetry, bilinearity, and nonassociativity by virtue of the Jacobi requirement. Clebsch potentials are seen to yield a conventional (canonical) formulation. This formulation is discretized by expansion in terms of an arbitrary complete set of basis functions. In particular, a wave field representation is obtained
A regularization method for solving the Poisson equation for mixed unbounded-periodic domains
DEFF Research Database (Denmark)
Spietz, Henrik Juul; Mølholm Hejlesen, Mads; Walther, Jens Honoré
2018-01-01
the regularized unbounded-periodic Green's functions can be implemented in an FFT-based Poisson solver to obtain a convergence rate corresponding to the regularization order of the Green's function. The high order is achieved without any additional computational cost from the conventional FFT-based Poisson solver...... and enables the calculation of the derivative of the solution to the same high order by direct spectral differentiation. We illustrate an application of the FFT-based Poisson solver by using it with a vortex particle mesh method for the approximation of incompressible flow for a problem with a single periodic...
DEFF Research Database (Denmark)
Harrod, Steven; Kelton, W. David
2006-01-01
with piecewise-constant instantaneous rate functions, a capability that has been implemented in commercial simulation software. They test these algorithms in C programs and make comparisons of accuracy, speed, and variability across disparate rate functions and microprocessor architectures. Choice of optimal......Nonstationary Poisson processes are appropriate in many applications, including disease studies, transportation, finance, and social policy. The authors review the risks of ignoring nonstationarity in Poisson processes and demonstrate three algorithms for generation of Poisson processes...... algorithm could not be predicted without knowledge of microprocessor architecture....
HUBBLE FINDS NEW DARK SPOT ON NEPTUNE
2002-01-01
NASA's Hubble Space Telescope has discovered a new great dark spot, located in the northern hemisphere of the planet Neptune. Because the planet's northern hemisphere is now tilted away from Earth, the new feature appears near the limb of the planet. The spot is a near mirror-image to a similar southern hemisphere dark spot that was discovered in 1989 by the Voyager 2 probe. In 1994, Hubble showed that the southern dark spot had disappeared. Like its predecessor, the new spot has high altitude clouds along its edge, caused by gasses that have been pushed to higher altitudes where they cool to form methane ice crystal clouds. The dark spot may be a zone of clear gas that is a window to a cloud deck lower in the atmosphere. Planetary scientists don t know how long lived this new feature might be. Hubble's high resolution will allow astronomers to follow the spot's evolution and other unexpected changes in Neptune's dynamic atmosphere. The image was taken on November 2, 1994 with Hubble's Wide Field Planetary Camera 2, when Neptune was 2.8 billion miles (4.5 billion kilometers) from Earth. Hubble can resolve features as small as 625 miles (1,000 kilometers) across in Neptune's cloud tops. Credit: H. Hammel (Massachusetts Institute of Technology) and NASA
Poisson cluster analysis of cardiac arrest incidence in Columbus, Ohio.
Warden, Craig; Cudnik, Michael T; Sasson, Comilla; Schwartz, Greg; Semple, Hugh
2012-01-01
Scarce resources in disease prevention and emergency medical services (EMS) need to be focused on high-risk areas of out-of-hospital cardiac arrest (OHCA). Cluster analysis using geographic information systems (GISs) was used to find these high-risk areas and test potential predictive variables. This was a retrospective cohort analysis of EMS-treated adults with OHCAs occurring in Columbus, Ohio, from April 1, 2004, through March 31, 2009. The OHCAs were aggregated to census tracts and incidence rates were calculated based on their adult populations. Poisson cluster analysis determined significant clusters of high-risk census tracts. Both census tract-level and case-level characteristics were tested for association with high-risk areas by multivariate logistic regression. A total of 2,037 eligible OHCAs occurred within the city limits during the study period. The mean incidence rate was 0.85 OHCAs/1,000 population/year. There were five significant geographic clusters with 76 high-risk census tracts out of the total of 245 census tracts. In the case-level analysis, being in a high-risk cluster was associated with a slightly younger age (-3 years, adjusted odds ratio [OR] 0.99, 95% confidence interval [CI] 0.99-1.00), not being white, non-Hispanic (OR 0.54, 95% CI 0.45-0.64), cardiac arrest occurring at home (OR 1.53, 95% CI 1.23-1.71), and not receiving bystander cardiopulmonary resuscitation (CPR) (OR 0.77, 95% CI 0.62-0.96), but with higher survival to hospital discharge (OR 1.78, 95% CI 1.30-2.46). In the census tract-level analysis, high-risk census tracts were also associated with a slightly lower average age (-0.1 years, OR 1.14, 95% CI 1.06-1.22) and a lower proportion of white, non-Hispanic patients (-0.298, OR 0.04, 95% CI 0.01-0.19), but also a lower proportion of high-school graduates (-0.184, OR 0.00, 95% CI 0.00-0.00). This analysis identified high-risk census tracts and associated census tract-level and case-level characteristics that can be used to
Multilevel Methods for the Poisson-Boltzmann Equation
Holst, Michael Jay
We consider the numerical solution of the Poisson -Boltzmann equation (PBE), a three-dimensional second order nonlinear elliptic partial differential equation arising in biophysics. This problem has several interesting features impacting numerical algorithms, including discontinuous coefficients representing material interfaces, rapid nonlinearities, and three spatial dimensions. Similar equations occur in various applications, including nuclear physics, semiconductor physics, population genetics, astrophysics, and combustion. In this thesis, we study the PBE, discretizations, and develop multilevel-based methods for approximating the solutions of these types of equations. We first outline the physical model and derive the PBE, which describes the electrostatic potential of a large complex biomolecule lying in a solvent. We next study the theoretical properties of the linearized and nonlinear PBE using standard function space methods; since this equation has not been previously studied theoretically, we provide existence and uniqueness proofs in both the linearized and nonlinear cases. We also analyze box-method discretizations of the PBE, establishing several properties of the discrete equations which are produced. In particular, we show that the discrete nonlinear problem is well-posed. We study and develop linear multilevel methods for interface problems, based on algebraic enforcement of Galerkin or variational conditions, and on coefficient averaging procedures. Using a stencil calculus, we show that in certain simplified cases the two approaches are equivalent, with different averaging procedures corresponding to different prolongation operators. We also develop methods for nonlinear problems based on a nonlinear multilevel method, and on linear multilevel methods combined with a globally convergent damped-inexact-Newton method. We derive a necessary and sufficient descent condition for the inexact-Newton direction, enabling the development of extremely
Pink Spot - Literature Review and Case Report.
Petel, Roy; Fuks, Anna
Pink spots in teeth were first described by Mummery in 1920, and were related to resorption. Resorption is a pathologic process that often eludes the clinician with its varied etiologic factors and diverse clinical presentations. Resorption can be generally classified as internal and external resorption. Internal resorption has been described as a rare occurrence as compared to external resorption. This article describes a pink spot that was diagnosed as a progressing resorption process. Early diagnosis enabled a successful management of the lesion. Early diagnosis and treatment of an internal resorption, clinically seen as a pink spot, in a primary central incisor may prevent its fast progress and subsequent loss.
DEFF Research Database (Denmark)
Smith, Cameron; Thilsted, Anil Haraksingh; Garcia-Ortiz, Cesar E.
2014-01-01
We demonstrate >50% conversion of light to V-groove channel plasmon-polaritons (CPPs) via compact waveguide-termination mirrors. Devices are fabricated using UV-lithography and crystallographic silicon etching. The V-shape is tailored by thermal oxidation to support confined CPPs....
Magnetic anisotropy in a permalloy microgrid fabricated by near-field optical lithography
International Nuclear Information System (INIS)
Li, S. P.; Lebib, A.; Peyrade, D.; Natali, M.; Chen, Y.; Lew, W. S.; Bland, J. A. C.
2001-01-01
We report the fabrication and magnetic properties of permalloy microgrids prepared by near-field optical lithography and characterized using high-sensitivity magneto-optical Kerr effect techniques. A fourfold magnetic anisotropy induced by the grid architecture is identified. [copyright] 2001 American Institute of Physics
Combination photo and electron beam lithography with polymethyl methacrylate (PMMA) resist
Carbaugh, Daniel J.; Pandya, Sneha G.; Wright, Jason T.; Kaya, Savas; Rahman, Faiz
2017-11-01
We describe techniques for performing photolithography and electron beam lithography in succession on the same resist-covered substrate. Larger openings are defined in the resist film through photolithography whereas smaller openings are defined through conventional electron beam lithography. The two processes are carried out one after the other and without an intermediate wet development step. At the conclusion of the two exposures, the resist film is developed once to reveal both large and small openings. Interestingly, these techniques are applicable to both positive and negative tone lithographies with both optical and electron beam exposure. Polymethyl methacrylate, by itself or mixed with a photocatalytic cross-linking agent, is used for this purpose. We demonstrate that such resists are sensitive to both ultraviolet and electron beam irradiation. All four possible combinations, consisting of optical and electron beam lithographies, carried out in positive and negative tone modes have been described. Demonstration grating structures have been shown and process conditions have been described for all four cases.
Chen, Ying-Chieh
2009-01-01
Multibeam interference lithography is investigated as a manufacturing technique for three-dimensional photonic crystal templates. In this research, optimization of the optical setup and the photoresist initiation system leads to a significant improvement of the optical quality of the crystal, as characterized by normal incidence optical…
Gerber, Ralph W.; Oliver-Hoyo, Maria T.
2008-01-01
This experiment is designed to expose undergraduate students to the process of selective etching by using soft lithography and the resulting electrical properties of multilayered films fabricated via self-assembly of gold nanoparticles. Students fabricate a conductive film of gold on glass, apply a patterned resist using a polydimethylsiloxane…
Report of the fifth workshop on synchrotron x-ray lithography
International Nuclear Information System (INIS)
Williams, G.P.; Godel, J.B.; Brown, G.S.
1989-01-01
Semiconductors comprise a greater part of the United States economy than the aircraft, steel and automobile industries combined. In future the semiconductor manufacturing industry will be forced to switch away from present optical manufacturing methods in the early to mid 1990's. X-ray lithography has emerged as the leading contender for continuing production below the 0.4 micron level. Brookhaven National Laboratory began a series of workshops on x-ray lithography in 1986 to examine key issues and in particular to enable United States industry to take advantage of the technical base established in this field. Since accelerators provide the brightest sources for x-ray lithography, most of the research and development to date has taken place at large accelerator-based research centers such as Brookhaven, the University of Wisconsin and Stanford. The goals of this Fifth Brookhaven Workshop were to review progress and goals since the last workshop and to establish a blueprint for the future. The meeting focused on the ''Exposure Tool,'' that is, a term defined as the source plus beamline and stepper. In order to assess the appropriateness of schedules for the development of this tool, other aspects of the required technology such as masks, resists and inspection and repair were also reviewed. To accomplish this, two working groups were set up, one to review the overall aspects of x-ray lithography and set a time frame, the other to focus on sources
Highland, Zachary L.; Saner, ChaMarra K.; Garno, Jayne C.
2018-01-01
Experiments are described that involve undergraduates learning concepts of nanoscience and chemistry. Students prepare nanopatterns of organosilane films using protocols of particle lithography. A few basic techniques are needed to prepare samples, such as centrifuging, mixing, heating, and drying. Students obtain hands-on skills with nanoscale…
Spectral purification and infrared light recycling in extreme ultraviolet lithography sources
Bayraktar, M.; van Goor, F. A.; Boller, K. J.; F. Bijkerk,
2014-01-01
We present the design of a novel collector mirror for laser produced plasma (LPP) light sources to be used in extreme ultraviolet (EUV) lithography. The design prevents undesired infrared (IR) drive laser light, reflected from the plasma, from reaching the exit of the light source. This results in a
Mask writing time explosion and its effect on CD control in e-beam lithography
Lee, Sang Hee; Choi, Jin; Min, Seong Jun; Kim, Hee Bom; Kim, Byung Gook; Woo, Sang-Gyun; Cho, Han-Ku
2010-05-01
As semiconductor features shrink in size and pitch, the extreme control of CD uniformity and MTT is needed for mask fabrication with e-beam lithography. And because of huge shot density of data, the writing time of e-beam lithography for mask fabrication will be increased rapidly in future design node. The beam drift caused by charging of optic system and current density drift can affect the beam size, position and exposure dose stability. From the empirical data, those are the function of writing time. Although e-beam lithography tool has the correction function which can be applied during writing, there are remained errors after correction which result in CD uniformity error. According to the writing time increasing, the residual error of correction will be more important and give the limit of CD uniformity and MTT. In this study, we study the beam size and exposure dose error as a function of time. Those are mainly caused by charging and current density drift. And we present the predicted writing time of e-beam lithography below 32nm node and estimate its effect on CD control error. From the relation between writing time and CD control error, we achieve the limit of CD uniformity with e-beam mask writer. And we suggest the method to achieve required CD uniformity at 22nm node and beyond.
Kaestner, Marcus; Hofer, Manuel; Rangelow, Ivo W.
2013-07-01
Going "beyond the CMOS information-processing era," taking advantage of quantum effects occurring at sub-10-nm level, requires novel device concepts and associated fabrication technologies able to produce promising features at acceptable cost levels. Herein, the challenge affecting the lithographic technologies comprises the marriage of down-scaling the device-relevant feature size towards single-nanometer resolution with a simultaneous increase of the throughput capabilities. Mix-and-match lithographic strategies are one promising path to break through this trade-off. Proof-of-concept combining electron beam lithography (EBL) with the outstanding capabilities of closed-loop electric field current-controlled scanning probe nanolithography (SPL) is demonstrated. This combination, whereby also extreme ultraviolet lithography (EUVL) is possible instead of EBL, enables more: improved patterning resolution and reproducibility in combination with excellent overlay and placement accuracy. Furthermore, the symbiosis between EBL (EUVL) and SPL expands the process window of EBL (EUVL) beyond the state of the art, allowing SPL-based pre- and post-patterning of EBL (EUVL) written features at critical dimension levels with scanning probe microscopy-based pattern overlay alignment capability. Moreover, we are able to modify the EBL (EUVL) pattern even after the development step. The ultra-high resolution mix-and-match lithography experiments are performed on the molecular glass resist calixarene using a Gaussian e-beam lithography system operating at 10 keV and a home-developed SPL setup.
Report of the fifth workshop on synchrotron x-ray lithography
Energy Technology Data Exchange (ETDEWEB)
Williams, G.P.; Godel, J.B. (Brookhaven National Lab., Upton, NY (USA)); Brown, G.S. (Stanford Univ., CA (USA). Stanford Synchrotron Radiation Lab.); Liebmann, W. (Suss (Karl) America, Essex Junction, VT (USA))
1989-01-01
Semiconductors comprise a greater part of the United States economy than the aircraft, steel and automobile industries combined. In future the semiconductor manufacturing industry will be forced to switch away from present optical manufacturing methods in the early to mid 1990's. X-ray lithography has emerged as the leading contender for continuing production below the 0.4 micron level. Brookhaven National Laboratory began a series of workshops on x-ray lithography in 1986 to examine key issues and in particular to enable United States industry to take advantage of the technical base established in this field. Since accelerators provide the brightest sources for x-ray lithography, most of the research and development to date has taken place at large accelerator-based research centers such as Brookhaven, the University of Wisconsin and Stanford. The goals of this Fifth Brookhaven Workshop were to review progress and goals since the last workshop and to establish a blueprint for the future. The meeting focused on the Exposure Tool,'' that is, a term defined as the source plus beamline and stepper. In order to assess the appropriateness of schedules for the development of this tool, other aspects of the required technology such as masks, resists and inspection and repair were also reviewed. To accomplish this, two working groups were set up, one to review the overall aspects of x-ray lithography and set a time frame, the other to focus on sources.
Latex particle template lift-up guided gold wire-networks via evaporation lithography
Lone, Saifullah
2014-01-01
We describe a hybrid methodology that combines a two dimensional (2D) monolayer of latex particles (with a pitch size down to 1 μm) prepared by horizontal dry deposition, lift-up of a 2D template onto flat surfaces and evaporation lithography to fabricate metal micro- and nano wire-networks. This journal is
Lithography focus/exposure control and corrections to improve CDU at post etch step
Kim, Young Ki; Yelverton, Mark; Tristan, John; Lee, Joungchel; Gutjahr, Karsten; Hsu, Ching-Hsiang; Wei, Hong; Wang, Lester; Li, Chen; Subramany, Lokesh; Chung, Woong Jae; Kim, Jeong Soo; Ramanathan, Vidya; Yap, LipKong; Gao, Jie; Karur-Shanmugam, Ram; Golotsvan, Anna; Herrera, Pedro; Huang, Kevin; Pierson, Bill
2014-04-01
As leading edge lithography moves to advanced nodes in high-mix, high-volume manufacturing environment, automated control of critical dimension (CD) within wafer has become a requirement. Current control methods to improve CD uniformity (CDU) generally rely upon the use of field by field exposure corrections via factory automation or through scanner sub-recipe. Such CDU control methods are limited to lithography step and cannot be extended to etch step. In this paper, a new method to improve CDU at post etch step by optimizing exposure at lithography step is introduced. This new solution utilizes GLOBALFOUNDRIES' factory automation system and KLA-Tencor's K-T Analyzer as the infrastructure to calculate and feed the necessary field by field level exposure corrections back to scanner, so as to achieve the optimal CDU at post etch step. CD at post lithography and post etch steps are measured by scatterometry metrology tools respectively and are used by K-T Analyzer as the input for correction calculations. This paper will explain in detail the philosophy as well as the methodology behind this novel CDU control solution. In addition, applications and use cases will be reviewed to demonstrate the capability and potential of this solution. The feasibility of adopting this solution in high-mix, high-volume manufacturing environment will be discussed as well.
Silicon oxide nanoimprint stamp fabrication by edge lithography reinforced with silicon nitride
Zhao, Yiping; Berenschot, Johan W.; de Boer, Meint J.; Jansen, Henricus V.; Tas, Niels Roelof; Huskens, Jurriaan; Elwenspoek, Michael Curt
2007-01-01
The fabrication of silicon oxide nanoimprint stamp employing edge lithography in combination with silicon nitride deposition is presented. The fabrication process is based on conventional photolithography an weg etching methods. Nanoridges with width dimension of sub-20 nm were fabricated by edge
High-quality global hydrogen silsequioxane contact planarization for nanoimprint lithography
Büyükköse, S.; Vratzov, Boris; van der Wiel, Wilfred Gerard
2011-01-01
The authors present a novel global contact planarization technique based on the spin-on-glass material hydrogen silsequioxane (HSQ) and demonstrate its excellent performance on patterns of 70 nm up to several microns generated by UV-based nanoimprint lithography. The HSQ layer (∼165 nm) is spin
Computational aspects of optical lithography extension by directed self-assembly
Lai, Kafai; Liu, Chi-chun; Pitera, Jed; Dechene, Daniel J.; Schepis, Anthony; Abdallah, Jassem; Tsai, Hsinyu; Guillorn, Mike; Cheng, Joy; Doerk, Gregory; Tjio, Melia; Rettner, Charles; Odesanya, Olalekan; Ozlem, Melih; Lafferty, Neal
2013-04-01
EUV insertion timing for High Volume Manufacturing is still an uncertainty due to source power and EUV mask infrastructure limitations. Directed Self Assembly (DSA) processes offer the promise of providing alternative ways to extend optical lithography cost-effectively for use in the 10nm node and beyond. The goal of this paper is to look into the technical prospect of DSA technology, particularly in the computational and DFM area. We have developed a prototype computational patterning toolset in-house to enable an early Design -Technology Co-Optimization to study the feasibility of using DSA in patterning semiconductor devices and circuits. From this toolset we can identify the set of DSA specific design restrictions specific to a DSA process and plan to develop a novel full chip capable computational patterning solution with DSA. We discuss the DSA Computational Lithography (CL) infrastructure using the via and fin layers as examples. Early wafer data is collected from the DSA testmask that was built using these new toolsets. Finally we discuss the DSA ecosystem requirements for enabling DSA lithography and propose how EDA vendors can play a role in making DSA Lithography (DSAL) a full-chip viable technology for multiple process layers.
A Hands-on Activity for Teaching the Poisson Distribution Using the Stock Market
Dunlap, Mickey; Studstill, Sharyn
2014-01-01
The number of increases a particular stock makes over a fixed period follows a Poisson distribution. This article discusses using this easily-found data as an opportunity to let students become involved in the data collection and analysis process.
Optimized thick-wall cylinders by virtue of Poisson's ratio selection
International Nuclear Information System (INIS)
Whitty, J.P.M.; Henderson, B.; Francis, J.; Lloyd, N.
2011-01-01
The principal stress distributions in thick-wall cylinders due to variation in the Poisson's ratio are predicted using analytical and finite element methods. Analyses of appropriate brittle and ductile failure criteria show that under the isochoric pressure conditions investigated that auextic (i.e. those possessing a negative Poisson's ratio) materials act as stress concentrators; hence they are predicted to fail before their conventional (i.e. possessing a positive Poisson's ratio) material counterparts. The key finding of the work presented shows that for constrained thick-wall cylinders the maximum tensile principal stress can vanish at a particular Poisson's ratio and aspect ratio. This phenomenon is exploited in order to present an optimized design criterion for thick-wall cylinders. Moreover, via the use of a cogent finite element model, this criterion is also shown to be applicable for the design of micro-porous materials.
Hung, Tran Loc; Giang, Le Truong
2016-01-01
Using the Stein-Chen method some upper bounds in Poisson approximation for distributions of row-wise triangular arrays of independent negative-binomial distributed random variables are established in this note.
Equal-Time and Equal-Space Poisson Brackets of the N -Component Coupled NLS Equation
International Nuclear Information System (INIS)
Zhou Ru-Guang; Li Pei-Yao; Gao Yuan
2017-01-01
Two Poisson brackets for the N-component coupled nonlinear Schrödinger (NLS) equation are derived by using the variantional principle. The first one is called the equal-time Poisson bracket which does not depend on time but only on the space variable. Actually it is just the usual one describing the time evolution of system in the traditional theory of integrable Hamiltonian systems. The second one is equal-space and new. It is shown that the spatial part of Lax pair with respect to the equal-time Poisson bracket and temporal part of Lax pair with respect to the equal-space Poisson bracket share the same r-matrix formulation. These properties are similar to that of the NLS equation. (paper)
Ship-Track Models Based on Poisson-Distributed Port-Departure Times
National Research Council Canada - National Science Library
Heitmeyer, Richard
2006-01-01
... of those ships, and their nominal speeds. The probability law assumes that the ship departure times are Poisson-distributed with a time-varying departure rate and that the ship speeds and ship routes are statistically independent...
Remarks on 'Poisson ratio beyond the limits of the elasticity theory'
International Nuclear Information System (INIS)
Wojciechowski, K.W.
2002-12-01
The non-chiral, elastically isotropic model exhibits Poison ratios in the range -1 ≤ σ ≤ 1 without any molecular rotation. The centres of discs-atoms are replaced in the vertices of a perfect triangle of the side length equal to σ. The positive sign of the Lame constant λ is not necessary for the stability of an isotropic system at any dimensionality. As the upper limit for the Poisson ratio in 2D isotropic systems is 1, crystalline or polycrystalline 2D systems can be obtained having the Poisson ratio exceeding 1/2. Both the traditional theory of elasticity and the Cosserat one exclude Poisson ratios exceeding 1/2 in 3D isotropic systems. Neighter anisotropy nor rotation are necessary to obtain extreme values of the Poisson ratio (author)
2010-11-01
The resilient modulus and Poissons ratio of base and sublayers in highway use are : important parameters in design and quality control process. The currently used techniques : include CBR (California Bearing Ratio) test, resilient modulus test,...
International Nuclear Information System (INIS)
Grigoriu, Mircea; Samorodnitsky, Gennady
2004-01-01
Two methods are considered for assessing the asymptotic stability of the trivial solution of linear stochastic differential equations driven by Poisson white noise, interpreted as the formal derivative of a compound Poisson process. The first method attempts to extend a result for diffusion processes satisfying linear stochastic differential equations to the case of linear equations with Poisson white noise. The developments for the method are based on Ito's formula for semimartingales and Lyapunov exponents. The second method is based on a geometric ergodic theorem for Markov chains providing a criterion for the asymptotic stability of the solution of linear stochastic differential equations with Poisson white noise. Two examples are presented to illustrate the use and evaluate the potential of the two methods. The examples demonstrate limitations of the first method and the generality of the second method
Solution of the Kolmogorov-Nikol'skii problem for the Poisson integrals of continuous functions
International Nuclear Information System (INIS)
Stepanets, A I
2001-01-01
Asymptotic equalities are obtained for upper bounds of the deviations of Fourier sums in the classes of convolutions of Poisson kernels and continuous functions with moduli of continuity not exceeding fixed majorants
Appearance of eigen modes for the linearized Vlasov-Poisson equation
International Nuclear Information System (INIS)
Degond, P.
1983-01-01
In order to determine the asymptotic behaviour, when the time goes to infinity, of the solution of the linearized Vlasov-Poisson equation, we use eigen modes, associated to continuous linear functionals on a Banach space of analytic functions [fr
An improved FMM Algorithm of the 3d-linearized Poisson-Boltzmann Equation
Directory of Open Access Journals (Sweden)
Mehrez issa
2015-06-01
Full Text Available This paper presents a new FMM algorithm for the linearized Poisson-Boltzmann equation in three dimensions. The performance of the proposed algorithm is assessed on a example in three dimensions and compared with the direct method. The numerical results show the power of the new method, that allow to achieve the best schemes to reduce the time of the particle interactions, which are based on diagonal form of translation operators for linearized Poisson-Boltzmann equation.
Semiclassical limit and well-posedness of nonlinear Schrodinger-Poisson systems
Directory of Open Access Journals (Sweden)
Hailiang Li
2003-09-01
Full Text Available This paper concerns the well-posedness and semiclassical limit of nonlinear Schrodinger-Poisson systems. We show the local well-posedness and the existence of semiclassical limit of the two models for initial data with Sobolev regularity, before shocks appear in the limit system. We establish the existence of a global solution and show the time-asymptotic behavior of a classical solutions of Schrodinger-Poisson system for a fixed re-scaled Planck constant.
Chadha, Alka; Bora, Swaroop Nandan
2017-11-01
This paper studies the existence, uniqueness, and exponential stability in mean square for the mild solution of neutral second order stochastic partial differential equations with infinite delay and Poisson jumps. By utilizing the Banach fixed point theorem, first the existence and uniqueness of the mild solution of neutral second order stochastic differential equations is established. Then, the mean square exponential stability for the mild solution of the stochastic system with Poisson jumps is obtained with the help of an established integral inequality.
Stochastic Averaging of Strongly Nonlinear Oscillators under Poisson White Noise Excitation
Zeng, Y.; Zhu, W. Q.
A stochastic averaging method for single-degree-of-freedom (SDOF) strongly nonlinear oscillators under Poisson white noise excitation is proposed by using the so-called generalized harmonic functions. The stationary averaged generalized Fokker-Planck-Kolmogorov (GFPK) equation is solved by using the classical perturbation method. Then the procedure is applied to estimate the stationary probability density of response of a Duffing-van der Pol oscillator under Poisson white noise excitation. Theoretical results agree well with Monte Carlo simulations.
He, Meijuan; Xu, Wei; Sun, Zhongkui; Du, Lin
2015-11-01
This paper mainly investigates the phenomenon of stochastic resonance (SR) in a bistable system subjected to Poisson white noise. Statistical complexity measures, as new tools, are first employed to quantify SR phenomenon of given system with Poisson white noise. To begin with, the effect of Poisson white noise on SR phenomenon is studied. The results demonstrate that the curves of statistical complexity measures as a function of Poisson white noise intensity exhibit non-monotonous structure, revealing the existence of SR phenomenon. Besides, it should be noted that small mean arrival rate of Poisson white noise can promote the occurrence of SR. In order to verify the effectiveness of statistical complexity measures, signal-to-noise ratio (SNR) is also calculated. A good agreement among these results obtained by statistical complexity measures and SNR is achieved, which reveals that statistical complexity measures are suitable tools for characterizing SR phenomenon in the presence of Poisson white noise. Then, the effects of amplitude and frequency of different periodic signals, including cosine, rectangular and triangular signal, on SR behavior are investigated, respectively. One can observe that, in the case of same amplitude or frequency of signal, the influence of rectangular signal on SR phenomenon is the most significant among these three signals.
Asparagus Beetle and Spotted Asparagus Beetle
Hodgson, Erin W.; Drost, Dan
2007-01-01
Asparagus beetle, Crioceris asparagi, and spotted asparagus beetle, C. duodecimpunctata are leaf beetles in the family Chrysomelidae. These beetles feed exclusively on asparagus and are native to Europe. Asparagus beetle is the more economically injurious of the two species.
Detecting Blind Spot By Using Ultrasonic Sensor
Directory of Open Access Journals (Sweden)
T. S. Ajay
2015-08-01
Full Text Available Safety remains a top concern for automobile industries and new-car shoppers. Detection of Blind Spots is a major concern for safety issues. So automobiles have been constantly updating their products with new technologies to detect blind spots so that they can add more safety to the vehicle and also reduce the road accidents. Almost 1.5 million people die in road accidents each year. Blind spot of an automobile is the region of the vehicle which cannot be observed properly while looking either through side or rear mirror view. To meet the above requirements this paper describes detecting blind spot by using ultrasonic sensor and controlling the direction of car by automatic steering. The technology embedded in the system is capable of automatically steer the vehicle away from an obstacle if the system determines that a collision is impending or if the vehicle is in the vicinity of our car.