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Sample records for plasma sputter heavy

  1. Sputtering of Lunar Regolith by Solar Wind Protons and Heavy Ions, and General Aspects of Potential Sputtering

    Science.gov (United States)

    Alnussirat, S. T.; Sabra, M. S.; Barghouty, A. F.; Rickman, Douglas L.; Meyer, F.

    2014-01-01

    New simulation results for the sputtering of lunar soil surface by solar-wind protons and heavy ions will be presented. Previous simulation results showed that the sputtering process has significant effects and plays an important role in changing the surface chemical composition, setting the erosion rate and the sputtering process timescale. In this new work and in light of recent data, we briefly present some theoretical models which have been developed to describe the sputtering process and compare their results with recent calculation to investigate and differentiate the roles and the contributions of potential (or electrodynamic) sputtering from the standard (or kinetic) sputtering.

  2. Plasma debris sputter resistant x-ray mirror.

    Science.gov (United States)

    Amano, Sho; Inoue, Tomoaki; Harada, Tetsuo

    2013-06-01

    A diamond-like carbon (DLC) mirror, used as a grazing incident mirror in a plasma x-ray source, exhibits a high resistance to plasma debris sputtering. Good mirror reflectivity at a wavelength of 13.5 nm was confirmed using synchrotron radiation at the NewSUBARU facility. The erosion rate due to plasma debris sputtered at the incident debris angle of 20° was measured using a laser-produced Xe plasma source developed by the authors. The results indicate that the DLC film has a 5- and 15-fold higher sputtering resistance compared to films made of the traditional mirror materials Ru and Au, respectively. Because the DLC mirror retains a high sputtering resistance to Sn ions, it may be effective in Sn plasma source applications. We conclude that a grazing incident x-ray mirror coated with DLC can be of use as a plasma debris sputtering resistant mirror.

  3. Estimates of Sputter Yields of Solar-Wind Heavy Ions of Lunar Regolith Materials

    Science.gov (United States)

    Barghouty, Abdulmasser F.; Adams, James H., Jr.

    2008-01-01

    At energies of approximately 1 keV/amu, solar-wind protons and heavy ions interact with the lunar surface materials via a number of microscopic interactions that include sputtering. Solar-wind induced sputtering is a main mechanism by which the composition of the topmost layers of the lunar surface can change, dynamically and preferentially. This work concentrates on sputtering induced by solar-wind heavy ions. Sputtering associated with slow (speeds the electrons speed in its first Bohr orbit) and highly charged ions are known to include both kinetic and potential sputtering. Potential sputtering enjoys some unique characteristics that makes it of special interest to lunar science and exploration. Unlike the yield from kinetic sputtering where simulation and approximation schemes exist, the yield from potential sputtering is not as easy to estimate. This work will present a preliminary numerical scheme designed to estimate potential sputtering yields from reactions relevant to this aspect of solar-wind lunar-surface coupling.

  4. Plasma diagnostics during magnetron sputtering of aluminum doped zinc oxide

    DEFF Research Database (Denmark)

    Stamate, Eugen; Crovetto, Andrea; Sanna, Simone

    2016-01-01

    Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity of the f......Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity...

  5. Plasma properties of RF magnetron sputtering system using Zn target

    Energy Technology Data Exchange (ETDEWEB)

    Nafarizal, N.; Andreas Albert, A. R.; Sharifah Amirah, A. S.; Salwa, O.; Riyaz Ahmad, M. A. [Microelectronic and Nanotechnology - Shamsuddin Research Centre (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia 86400 Parit Raja, Batu Pahat, Johor (Malaysia)

    2012-06-29

    In the present work, we investigate the fundamental properties of magnetron sputtering plasma using Zn target and its deposited Zn thin film. The magnetron sputtering plasma was produced using radio frequency (RF) power supply and Argon (Ar) as ambient gas. A Langmuir probe was used to collect the current from the plasma and from the current intensity, we calculate the electron density and electron temperature. The properties of Zn sputtering plasma at various discharge conditions were studied. At the RF power ranging from 20 to 100 W and gas pressure 5 mTorr, we found that the electron temperature was almost unchanged between 2-2.5 eV. On the other hand, the electron temperature increased drastically from 6 Multiplication-Sign 10{sup 9} to 1 Multiplication-Sign 10{sup 10}cm{sup -3} when the discharge gas pressure increased from 5 to 10 mTorr. The electron microscope images show that the grain size of Zn thin film increase when the discharge power is increased. This may be due to the enhancement of plasma density and sputtered Zn density.

  6. Development of New Sputter System by Magnetic Null Plasma

    OpenAIRE

    敦田, 悟; 楊, 鍾煥; 川尻, 晋平; 成, 烈[ブン; 本田, 親久; 大坪, 昌久

    2004-01-01

    Abstract ###A new type of plasma system based on the magnetic neutral loop discharge (NLD) concept ###has been developed for sputter application. This system is characterized by plasma production ###around the multi null magnetic field on the electrode surface, where a capacitive RF electric ###field is applied. From the experimental results and numerical analysis of electron behavior in ###this system, we found that electrons around the magnetic null region on the target surface ###moved in ...

  7. Kinetic and Potential Sputtering of Lunar Regolith: Contribution of Solar-Wind Heavy Ions

    Science.gov (United States)

    Meyer, F. W.; Harris, P. R.; Meyer, H. M., III; Hijiazi, H.; Barghouty, A. F.

    2013-01-01

    Sputtering of lunar regolith by protons as well as solar-wind heavy ions is considered. From preliminary measurements of H+, Ar+1, Ar+6 and Ar+9 ion sputtering of JSC-1A AGGL lunar regolith simulant at solar wind velocities, and TRIM simulations of kinetic sputtering yields, the relative contributions of kinetic and potential sputtering contributions are estimated. An 80-fold enhancement of oxygen sputtering by Ar+ over same-velocity H+, and an additional x2 increase for Ar+9 over same-velocity Ar+ was measured. This enhancement persisted to the maximum fluences investigated is approximately 1016/cm (exp2). Modeling studies including the enhanced oxygen ejection by potential sputtering due to the minority heavy ion multicharged ion solar wind component, and the kinetic sputtering contribution of all solar wind constituents, as determined from TRIM sputtering simulations, indicate an overall 35% reduction of near-surface oxygen abundance. XPS analyses of simulant samples exposed to singly and multicharged Ar ions show the characteristic signature of reduced (metallic) Fe, consistent with the preferential ejection of oxygen atoms that can occur in potential sputtering of some metal oxides.

  8. IR emission from the target during plasma magnetron sputter deposition

    Energy Technology Data Exchange (ETDEWEB)

    Cormier, P.-A. [GREMI, Université d' Orléans, 14 rue d' Issoudun, B.P. 6744, 45067 Orleans Cedex2 (France); Thomann, A.-L., E-mail: anne-lise.thomann@univ-orleans.fr [GREMI, Université d' Orléans, 14 rue d' Issoudun, B.P. 6744, 45067 Orleans Cedex2 (France); Dolique, V. [LMA, Université Claude Bernard Lyon I 7 Avenue Pierre de Coubertin, 69622 Villeurbanne Cedex (France); Balhamri, A. [ChIPS, Université de Mons, 20 Place du Parc, 7000 Mons (Belgium); Université Hassan 1, École Supérieure de Technologie, 218 Berrechid (Morocco); Dussart, R.; Semmar, N.; Lecas, T.; Brault, P. [GREMI, Université d' Orléans, 14 rue d' Issoudun, B.P. 6744, 45067 Orleans Cedex2 (France); Snyders, R. [ChIPS, Université de Mons, 20 Place du Parc, 7000 Mons (Belgium); Materia Nova R and D Center, Avenue Corpernic 1, Mons (Belgium); Konstantinidis, S. [Materia Nova R and D Center, Avenue Corpernic 1, Mons (Belgium)

    2013-10-31

    In this article, energy flux measurements at the substrate location are reported. In particular, the energy flux related to IR radiation emanating from the titanium (10 cm in diam.) target surface is quantified during magnetron sputter deposition processes. In order to modulate the plasma–target surface interaction and the radiative energy flux thereof, the working conditions were varied systematically. The experiments were performed in balanced and unbalanced magnetic field configurations with direct current (DC), pulsed DC and high power impulse magnetron sputtering (HiPIMS) discharges. The power delivered to the plasma was varied too, typically from 100 to 800 W. Our data show that the IR contribution to the total energy flux at the substrate increases with the supplied sputter power and as the discharge is driven in a pulse regime. In the case of HiPIMS discharge generated with a balanced magnetic field, the energy flux associated to the IR radiation produced by the target becomes comparable to the energy flux originating from collisional processes (interaction of plasma particles such as ions, electron, sputtered atoms etc. with the substrate). From IR contribution, it was possible to estimate the rise of the target surface temperature during the sputtering process. Typical values found for a titanium target are in the range 210 °C to 870 °C. - Highlights: • During magnetron sputtering process the heated target emits IR radiation. • We follow in real time the energy transferred to the deposited film by IR radiation. • IR radiation can be the main energy contribution in balanced pulsed processes. • IR radiation might affect the deposition process and the final film properties.

  9. Modeling Solar-Wind Heavy-Ions' Potential Sputtering of Lunar KREEP Surface

    Science.gov (United States)

    Barghouty, A. F.; Meyer, F. W.; Harris, R. P.; Adams, J. H., Jr.

    2012-01-01

    Recent laboratory data suggest that potential sputtering may be an important weathering mechanism that can affect the composition of both the lunar surface and its tenuous exosphere; its role and implications, however, remain unclear. Using a relatively simple kinetic model, we will demonstrate that solar-wind heavy ions induced sputtering of KREEP surfaces is critical in establishing the timescale of the overall solar-wind sputtering process of the lunar surface. We will also also show that potential sputtering leads to a more pronounced and significant differentiation between depleted and enriched surface elements. We briefly discuss the impacts of enhanced sputtering on the composition of the regolith and the exosphere, as well as of solar-wind sputtering as a source of hydrogen and water on the moon.

  10. Spatiotemporal synchronization of drift waves in a magnetron sputtering plasma

    CERN Document Server

    Martines, E; Cavazzana, R; Adámek, J; Antoni, V; Serianni, G; Spolaore, M; Vianello, N

    2014-01-01

    A feedforward scheme is applied for drift waves control in a magnetized magnetron sputtering plasma. A system of driven electrodes collecting electron current in a limited region of the explored plasma is used to interact with unstable drift waves. Drift waves actually appear as electrostatic modes characterized by discrete wavelengths of the order of few centimeters and frequencies of about 100 kHz. The effect of external quasi-periodic, both in time and space, travelling perturbations is studied. Particular emphasis is given to the role played by the phase relation between the natural and the imposed fluctuations. It is observed that it is possible by means of localized electrodes, collecting currents which are negligible with respect to those flowing in the plasma, to transfer energy to one single mode and to reduce that associated to the others. Due to the weakness of the external action, only partial control has been achieved.

  11. Arc generation from sputtering plasma-dielectric inclusion interactions

    CERN Document Server

    Wickersham, C E J; Fan, J S

    2002-01-01

    Arcing during sputter deposition and etching is a significant cause of particle defect generation during device fabrication. In this article we report on the effect of aluminum oxide inclusion size, shape, and orientation on the propensity for arcing during sputtering of aluminum targets. The size, shape, and orientation of a dielectric inclusion plays a major role in determining the propensity for arcing and macroparticle emission. In previous studies we found that there is a critical inclusion size required for arcing to occur. In this article we used high-speed videos, electric arc detection, and measurements of particle defect density on wafers to study the effect of Al sub 2 O sub 3 inclusion size, shape, and orientation on arc rate, intensity, and silicon wafer particle defect density. We found that the cross-sectional area of the inclusion exposed to the sputtering plasma is the critical parameter that determines the arc rate and rate of macroparticle emission. Analysis of the arc rate, particle defect...

  12. Method and apparatus for sputtering with a plasma lens

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2016-09-27

    A plasma lens for enhancing the quality and rate of sputter deposition onto a substrate is described herein. The plasma lens serves to focus positively charged ions onto the substrate while deflecting negatively charged ions, while at the same time due to the line of sight positioning of the lens, allowing for free passage of neutrals from the target to the substrate. The lens itself is formed of a wound coil of multiple turns, inside of which are deposed spaced lens electrodes which are electrically paired to impress an E field overtop the B field generated by the coil, the potential applied to the electrodes increasing from end to end towards the center of the lens, where the applied voltage is set to a high potential at the center electrodes as to produce a potential minimum on the axis of the lens.

  13. Plasma-ion Induced Sputtering and Heating of Titan's Atmosphere

    Science.gov (United States)

    Johnson, R. E.; Tucker, O. J.

    2007-05-01

    Titan is unique among the outer solar system icy satellites in having an atmosphere with a column density about ten times that of the Earth's atmosphere and an atmospheric mass to solid mass ratio comparable to that of Venus. Atmospheres equivalent in size to that at Titan would have been removed from the icy Galilean satellites by the plasma trapped in the Jovian magnetosphere (Johnson 2004). Therefore, the use of Cassini data to determine the present erosion rate of Titan's atmosphere provides an important end point for studying the erosion and heating of planetary and satellite atmospheres by an ambient plasma. In this paper we describe the deposition of energy, the erosion and the expansion of the upper atmosphere of Titan using Direct Simulation Monte Carlo models (Shematovich et al. 2003; Michael et al. 2005; Michael and Johnson 2005). These calculations are used to calibrate semi-empirical models of atmospheric sputtering (Johnson 1994) that are used to interpret Cassini data at Titan. Using a number of plasma conditions, the temperature and density vs. altitude above the exobase and the rate of escape are calculated. References: Johnson, R.E. "Plasma-induced Sputtering of an Atmosphere" in Space Science Reviews 69 215-253 (1994). Johnson. R.E., " The magnetospheric plasmadriven evolution of satellite atmospheres" Astrophys. J. 609, L99-L102 (2004). Michael, M. and R.E. Johnson, "Energy deposition of pickup ions and heating of Titan's atmosphere", Planetary & Space Sci.53, 1510-1514 (2005). Michael M., R.E. Johnson, F. Leblanc, M. Liu, J.G. Luhmann, and V.I. Shematovich, "Ejection of nitrogen from Titan's atmosphere by magnetospheric ions and pick-up ions", Icarus 175, 263-267 (2005). Shematovich, V.I., R.E. Johnson, M. Michael, and J.G. Luhmann, "Nitrogen loss from Titan", JGR 108, No. E8, 5087, doi:10.1029/2003JE002094 (2003).

  14. High power impulse magnetron sputtering and related discharges: scalable plasma sources for plasma-based ion implantation and deposition

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2009-09-01

    High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the sputtered atoms. Related approaches, such as sustained self-sputtering, are also considered. The resulting intense flux of ions to the substrate consists of a mixture of metal and gas ions when using a process gas, or of metal ions only when using `gasless? or pure self-sputtering. In many respects, processing with HIPIMS plasmas is similar to processing with filtered cathodic arc plasmas, though the former is easier to scale to large areas. Both ion implantation and etching (high bias voltage, without deposition) and thin film deposition (low bias, or bias of low duty cycle) have been demonstrated.

  15. Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films

    Energy Technology Data Exchange (ETDEWEB)

    Chan, K.-Y. [Thin Film Laboratory, Faculty of Engineering, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)], E-mail: k.y.chan@fz-juelich.de; Luo, P.-Q.; Zhou, Z.-B. [Department of Physics, Shanghai Jiao Tong University, 800 Dongchuan Road, 200240 Shanghai (China); Tou, T.-Y.; Teo, B.-S. [Thin Film Laboratory, Faculty of Engineering, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)

    2009-03-01

    Physical vapor processes using glow plasma discharge are widely employed in microelectronic industry. In particular magnetron sputtering is a major technique employed for the coating of thin films. This paper addresses the influence of direct current (DC) plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper (Cu) thin films coated on silicon substrates. The influence of the sputtering parameters including DC plasma power and argon working gas pressure on the electrical and structural properties of the thin Cu films was investigated by means of surface profilometer, four-point probe and atomic force microscopy.

  16. Reduction in plasma potential by applying negative DC cathode bias in RF magnetron sputtering

    Science.gov (United States)

    Isomura, Masao; Yamada, Toshinori; Osuga, Kosuke; Shindo, Haruo

    2016-11-01

    We applied a negative DC bias voltage to the cathode of an RF magnetron sputtering system and successfully reduced the plasma potential in both argon plasma and hydrogen-diluted argon plasma. The crystallinity of the deposited Ge films is improved by increasing the negative DC bias voltage. It is indicated that the reduction in plasma potential is effective for reducing the plasma damage on deposited materials, caused by the electric potential between the plasma and substrates. In addition, the deposition rate is increased by the increased electric potential between the plasma and the cathode owing to the negative DC bias voltage. The present method successfully gives us higher speed and lower damage sputtering deposition. The increased electric potential between the plasma and the cathode suppresses the evacuation of electrons from the plasma and also enhances the generation of secondary electrons on the cathode. These probably suppress the electron loss from the plasma and result in the reduction in plasma potential.

  17. Production of fullerene ions by combining of plasma sputtering with laser ablation

    Energy Technology Data Exchange (ETDEWEB)

    Yamada, K., E-mail: yamada.keisuke@jaea.go.jp; Saitoh, Y.; Yokota, W. [Takasaki Advanced Radiation Research Institute, Japan Atomic Energy Agency, 1233 Watanuki, Takasaki, Gunma 370-1292 (Japan)

    2014-02-15

    We have produced C{sub 60} ion beams by combining plasma sputtering and laser ablation. A C{sub 60} sample was placed in an electron cyclotron resonance type ion source, negatively biased and sputtered by argon plasma. The beam current of C{sub 60}{sup +} decreased rapidly, but it was transiently recovered by a single laser shot that ablates the thin sample surface on the sputtered area. Temporal variations in beam current are reported in response to laser shots repeated at intervals of a few minutes.

  18. Chemical sputtering of graphite by low temperature nitrogen plasmas at various substrate temperatures and ion flux densities

    NARCIS (Netherlands)

    Bystrov, K.; Morgan, T. W.; Tanyeli, I.; De Temmerman, G.; M. C. M. van de Sanden,

    2013-01-01

    We report measurements of chemical sputtering yields of graphite exposed to low temperature nitrogen plasmas. The influence of surface temperature and incoming ion energy on the sputtering yields has been investigated in two distinct ion flux density regimes. Sputtering yields grow consistently with

  19. Investigations into the Anti-Felting Properties of Sputtered Wool Using Plasma Treatment

    Science.gov (United States)

    M. Borghei, S.; Shahidi, S.; Ghoranneviss, M.; Abdolahi, Z.

    2013-01-01

    In this research the effects of mordant and plasma sputtering treatments on the crystallinity and morphological properties of wool fabrics were investigated. The felting behavior of the treated samples was also studied. We used madder as a natural dye and copper sulfate as a metal mordant. We also used copper as the electrode material in a DC magnetron plasma sputtering device. The anti-felting properties of the wool samples before and after dying was studied, and it was shown that the shrink resistance and anti-felting behavior of the wool had been significantly improved by the plasma sputtering treatment. In addition, the percentage of crystallinity and the size of the crystals were investigated using an X-ray diffractometer, and a scanning electron microscope was used for morphological analysis. The amount of copper particles on the surface of the mordanted and sputtered fabrics was studied using the energy dispersive X-ray (EDX) method, and the hydrophobic properties of the samples were examined using the water drop test. The results show that with plasma sputtering treatment, the hydrophobic properties of the surface of wool become super hydrophobic.

  20. Nanostructure growth by helium plasma irradiation to tungsten in sputtering regime

    Energy Technology Data Exchange (ETDEWEB)

    Noiri, Y., E-mail: noiri-yasuyuki13@ees.nagoya-u.ac.jp [Graduate School of Engineering, Nagoya University, Nagoya 464-8603 (Japan); Kajita, S., E-mail: kajita@ees.nagoya-u.ac.jp [EcoTopia Science Institute, Nagoya University, Nagoya 464-8603 (Japan); Ohno, N. [Graduate School of Engineering, Nagoya University, Nagoya 464-8603 (Japan)

    2015-08-15

    The formation of nanostructure on tungsten (W) surface due to Helium (He) plasma irradiation can be harmful for fusion reactors. Up to now, W nanostructure growth was investigated mainly without sputtering. Under sputtering regime, nanostructure growth competes with erosion due to sputtering. In this study, the nanostructure growth was investigated in the linear divertor simulator NAGDIS-II at incident ion energy range of 200–500 eV. The growth of nanostructures was investigated by experiments and calculations under the sputtering regime. With increasing incident ion energy, the thickness of nanostructured W layer saturated rapidly at a lower He fluence, resulting in thinner W nanostructured layer. The erosion rate of the top of the W nanostructured layer was obtained from the comparison with the numerical calculation.

  1. Validity of "sputtering and re-condensation" model in active screen cage plasma nitriding process

    Science.gov (United States)

    Saeed, A.; Khan, A. W.; Jan, F.; Abrar, M.; Khalid, M.; Zakaullah, M.

    2013-05-01

    The validity of "sputtering and re-condensation" model in active screen plasma nitriding for nitrogen mass transfer mechanism is investigated. The dominant species including NH, Fe-I, N2+, N-I and N2 along with Hα and Hβ lines are observed in the optical emission spectroscopy (OES) analysis. Active screen cage and dc plasma nitriding of AISI 316 stainless steel as function of treatment time is also investigated. The structure and phases composition of the nitrided layer is studied by X-ray diffraction (XRD). Surface morphology is studied by scanning electron microscopy (SEM) and hardness profile is obtained by Vicker's microhardness tester. Increasing trend in microhardness is observed in both cases but the increase in active screen plasma nitriding is about 3 times greater than that achieved by dc plasma nitriding. On the basis of metallurgical and OES observations the use of "sputtering and re-condensation" model in active screen plasma nitriding is tested.

  2. Thin Film Formation of Gallium Nitride Using Plasma-Sputter Deposition Technique

    Directory of Open Access Journals (Sweden)

    R. Flauta

    2003-06-01

    Full Text Available The formation of gallium nitride (GaN thin film using plasma-sputter deposition technique has beenconfirmed. The GaN film deposited on a glass substrate at an optimum plasma condition has shown x-raydiffraction (XRD peaks at angles corresponding to that of (002 and (101 reflections of GaN. The remainingmaterial on the sputtering target exhibited XRD reflections corresponding to that of bulk GaN powder. Toimprove the system’s base pressure, a new UHV compatible system is being developed to minimize theimpurities in residual gases during deposition. The sputtering target configuration was altered to allow themonitoring of target temperature using a molybdenum (Mo holder, which is more stable against Gaamalgam formation than stainless steel.

  3. BN coatings deposition by magnetron sputtering of B and BN targets in electron beam generated plasma

    Science.gov (United States)

    Kamenetskikh, A. S.; Gavrilov, N. V.; Koryakova, O. V.; Cholakh, S. O.

    2017-05-01

    Boron nitride coatings were deposited by reactive pulsed magnetron sputtering of B and BN targets (50 kHz, 10 µs for B; 13.56 MHz for BN) at 2-20 mA/cm2 ion current density on the substrate. The effect of electron beam generated plasma on characteristics of magnetron discharge and phase composition of coatings was studied.

  4. Plasma properties during magnetron sputtering of lithium phosphorous oxynitride thin films

    DEFF Research Database (Denmark)

    Christiansen, Ane Sælland; Stamate, Eugen; Thydén, Karl Tor Sune

    2015-01-01

    properties and microstructure of the films. Low pressure and moderate power are associated with lower plasma density, higher electron temperature, higher plasma potential and larger diffusion length for sputtered particles. This combination of parameters favors the presence of more atomic nitrogen, a fact...... that correlates with a higher ionic conductivity. Despite of lower plasma density the film grows faster at lower pressure where the higher plasma potential, translated into higher energy for impinging ions on the substrate, resulted in a compact and smooth film structure. Higher pressures showed much less...

  5. The diffusion transfer of sputtered atoms in plasma spraying on the internal cylindrical surface

    Energy Technology Data Exchange (ETDEWEB)

    Bondarenko, G.G. [Moscow State University of Electronics and Mathematics, Moscow (Russian Federation); Bonk, O.G.; Kristya, V.I. [Kaluga Branch of N.E. Bauman Moscow University of Technology, Moscow (Russian Federation)

    2001-07-01

    The sputtering of the surface of the solid by the glow discharge plasma is used widely in the electronics for the deposition of thin films. The sputtered atoms (SA), leaving the surface, clash with the gas atoms and the granules the energy. It is interesting to examine the effect of the condensation coefficient of the SA on the concentration of the SA in the cylindrical discharge volume and the fluxes of the SA to different areas of the wall. The solution of this problem for the case of the diffusion transfer of the SA is the subject of this work.

  6. Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Ehiasarian, Arutiun P; Andersson, Joakim; Anders, Andr& #233

    2010-04-18

    The plasma composition of high power impulse magnetron sputtering (HIPIMS) has been studied for titanium and chromium targets using a combined energy analyser and quadrupole mass spectrometer. Measurements were done at distances from 50 to 300 mm from the sputtering target. Ti and Cr are similar in atomic mass but have significantly different sputter yields, which gives interesting clues on the effect of the target on plasma generation and transport of atoms. The Ti and Cr HIPIMS plasmas operated at a peak target current density of ~;;0.5 A cm-2. The measurements of the argon and metal ion content as well as the ion energy distribution functions showed that (1) singly and doubly charged ions were found for argon as well as for the target metal, (2) the majority of ions were singly charged argon for both metals at all distances investigated, (3) the Cr ion density was maintained to distances further from the target than Ti. Gas rarefaction was identified as a main factor promoting transport of metal ions, with the stronger effect observed for Cr, the material with higher sputter yield. Cr ions were found to displace a significant portion of the gas ions, whereas this was less evident in the Ti case. The observations indicate that the presence of metal vapour promotes charge exchange and reduces the electron temperature and thereby practically prevents the production of Ar2+ ions near the target. The content of higher charge states of metal ions depends on the probability of charge exchange with argon.

  7. Structuring of DLC:Ag nanocomposite thin films employing plasma chemical etching and ion sputtering

    Science.gov (United States)

    Tamulevičius, Tomas; Tamulevičienė, Asta; Virganavičius, Dainius; Vasiliauskas, Andrius; Kopustinskas, Vitoldas; Meškinis, Šarūnas; Tamulevičius, Sigitas

    2014-12-01

    We analyze structuring effects of diamond like carbon based silver nanocomposite (DLC:Ag) thin films by CF4/O2 plasma chemical etching and Ar+ sputtering. DLC:Ag films were deposited employing unbalanced reactive magnetron sputtering of silver target with Ar+ in C2H2 gas atmosphere. Films with different silver content (0.6-12.9 at.%) were analyzed. The films (as deposited and exposed to plasma chemical etching) were characterized employing scanning electron microscopy and energy dispersive X-ray analysis (SEM/EDS), optical microscopy, ultraviolet-visible light (UV-VIS) spectroscopy and Fourier transform infrared (FTIR) spectroscopy. After deposition, the films were plasma chemically etched in CF4/O2 mixture plasma for 2-6 min. It is shown that optical properties of thin films and silver nano particle size distribution can be tailored during deposition changing the magnetron current and C2H2/Ar ratio or during following plasma chemical etching. The plasma etching enabled to reveal the silver filler particle size distribution and to control silver content on the surface that was found to be dependent on Ostwald ripening process of silver nano-clusters. Employing contact lithography and 4 μm period mask in photoresist or aluminum the films were patterned employing CF4/O2 mixture plasma chemical etching, direct Ar+ sputtering or combined etching processes. It is shown that different processing recipes result in different final grating structures. Selective carbon etching in CF4/O2 gas mixture with photoresist mask revealed micrometer range lines of silver nanoparticles, while Ar+ sputtering and combined processing employing aluminum mask resulted in nanocomposite material (DLC:Ag) micropatterns.

  8. Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

    Energy Technology Data Exchange (ETDEWEB)

    Macak, Karol [Department of Physics, Linkoeping University, SE-581 83 Linkoeping, (Sweden); Kouznetsov, Vladimir [Department of Physics, Linkoeping University, SE-581 83 Linkoeping, (Sweden); Schneider, Jochen [Department of Physics, Linkoeping University, SE-581 83 Linkoeping, (Sweden); Helmersson, Ulf [Department of Physics, Linkoeping University, SE-581 83 Linkoeping, (Sweden); Petrov, Ivan [Materials Science Department and Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801 (United States)

    2000-07-01

    Time resolved plasma probe measurements of a novel high power density pulsed plasma discharge are presented. Extreme peak power densities in the pulse (on the order of several kW cm{sup -2}) result in a very dense plasma with substrate ionic flux densities of up to 1 A cm{sup -2} at source-to-substrate distances of several cm and at a pressure of 0.13 Pa (1 mTorr). The pulse duration was {approx}100 {mu}s with a pulse repetition frequency of 50 Hz. The plasma consists of metallic and inert gas ions, as determined from time resolved Langmuir probe measurements and in situ optical emission spectroscopy data. It was found that the plasma composition at the beginning of the pulse was dominated by Ar ions. As time elapsed metal ions were detected and finally dominated the ion composition. The effect of the process parameters on the temporal development of the ionic fluxes is discussed. The ionized portion of the sputtered metal flux was found to have an average velocity of 2500 m s{sup -1} at 6 cm distance from the source, which conforms to the collisional cascade sputtering theory. The degree of ionization of the sputtered metal flux at a pressure of 0.13 Pa was found to be 40%{+-}20% by comparing the total flux of deposited atoms with the charge measured for the metal ions in the pulse. (c) 2000 American Vacuum Society.

  9. Development Of Sputtering Models For Fluids-Based Plasma Simulation Codes

    Science.gov (United States)

    Veitzer, Seth; Beckwith, Kristian; Stoltz, Peter

    2015-09-01

    Rf-driven plasma devices such as ion sources and plasma processing devices for many industrial and research applications benefit from detailed numerical modeling. Simulation of these devices using explicit PIC codes is difficult due to inherent separations of time and spatial scales. One alternative type of model is fluid-based codes coupled with electromagnetics, that are applicable to modeling higher-density plasmas in the time domain, but can relax time step requirements. To accurately model plasma-surface processes, such as physical sputtering and secondary electron emission, kinetic particle models have been developed, where particles are emitted from a material surface due to plasma ion bombardment. In fluid models plasma properties are defined on a cell-by-cell basis, and distributions for individual particle properties are assumed. This adds a complexity to surface process modeling, which we describe here. We describe the implementation of sputtering models into the hydrodynamic plasma simulation code USim, as well as methods to improve the accuracy of fluids-based simulation of plasmas-surface interactions by better modeling of heat fluxes. This work was performed under the auspices of the Department of Energy, Office of Basic Energy Sciences Award #DE-SC0009585.

  10. Angular distribution of sputtered atoms induced by low-energy heavy ion bombardment

    Institute of Scientific and Technical Information of China (English)

    ZHANG Lai; ZHANG Zhu-Lin

    2004-01-01

    The sputtering yield angular distributions have been calculated based on the ion energy dependence of total sputtering yields for Ni and Motargets bombarded by low-energy Hg+ ion. The calculated curves show excellent agreement with the corresponding Wehner's experimental results of sputtering yield angular distribution. The fact clearly demonstrated the intrinsic relation between the ion energy dependence of total sputtering yields and the sputtering yield angular distribution. This intrinsic relation had been ignored in Yamamura's papers (1981,1982) due to some obvious mistakes.

  11. Properties of AlN films deposited by reactive ion-plasma sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Bert, N. A.; Bondarev, A. D.; Zolotarev, V. V.; Kirilenko, D. A.; Lubyanskiy, Ya. V.; Lyutetskiy, A. V.; Slipchenko, S. O.; Petrunov, A. N.; Pikhtin, N. A., E-mail: nike@hpld.ioffe.ru; Ayusheva, K. R.; Arsentyev, I. N.; Tarasov, I. S. [Russian Academy of Sciences, Ioffe Physical–Technical Institute (Russian Federation)

    2015-10-15

    The properties of SiO{sub 2}, Al{sub 2}O{sub 3}, and AlN dielectric coatings deposited by reactive ion-plasma sputtering are studied. The refractive indices of the dielectric coatings are determined by optical ellipsometry. It is shown that aluminum nitride is the optimal material for achieving maximum illumination of the output mirror of a semiconductor laser. A crystalline phase with a hexagonal atomic lattice and oxygen content of up to 10 at % is found by transmission electron microscopy in the aluminum-nitride films. It is found that a decrease in the concentration of residual oxygen in the chamber of the reactive ion-plasma sputtering installation makes it possible to eliminate the appearance of vertical pores in the bulk of the aluminum-nitride film.

  12. Microstructural characterisation of tungsten coatings deposited using plasma sputtering on Si substrates

    Energy Technology Data Exchange (ETDEWEB)

    Vassallo, E., E-mail: vassallo@ifp.cnr.it [Istituto di Fisica del Plasma, CNR, via R. Cozzi 53, 20125 Milano (Italy); Caniello, R. [Istituto di Fisica del Plasma, CNR, via R. Cozzi 53, 20125 Milano (Italy); Canetti, M. [Istituto per lo Studio delle Macromolecole, CNR, via Bassini 15, 20133 Milano (Italy); Dellasega, D.; Passoni, M. [Istituto di Fisica del Plasma, CNR, via R. Cozzi 53, 20125 Milano (Italy); Dipartimento di Energia, NEMAS, Politecnico di Milano, via Ponzio 34/3, 20133 Milano (Italy)

    2014-05-02

    Nanostructured W thin films synthesized by RF Plasma system have been characterized. These coatings may have appeal for functional applications, e.g. in corrosion resistance and barrier film. The role of the some process parameters, like pressure and sputter gas, has been investigated. We have shown that the microstructure (α and β-W phase) can be tuned as a function of the sputter gas and substrate pretreatment. - Highlights: • The microstructure of W coatings can be tuned by changing the process gas. • The microstructure can be also tuned by a H{sub 2} plasma pre-treatment of the substrate. • The intrinsic stress of W coatings can be eliminated using a microstructure in multilayer.

  13. Combined Monte Carlo and Fluid Sputter Transport Model in an Ionized PVD System with Experimental Plasma Characterization

    Science.gov (United States)

    Ruzic, David N.; Juliano, Daniel R.; Hayden, Douglas B.; Allain, Monica M. C.

    1998-10-01

    A code has been developed to model the transport of sputtered material in a modified industrial-scale magnetron. The device has a target diameter of 355 mm and was designed for 200 mm substrates. The chamber has been retrofitted with an auxilliary RF inductive plasma source located between the target and substrate. The source consists of a water-cooled copper coil immersed in the plasma, but with a diameter large enough to prevent shadowing of the substrate. The RF plasma, target sputter flux distribution, background gas conditions, and geometry are all inputs to the code. The plasma is characterized via a combination of a Langmuir probe apparatus and the results of a simple analytic model of the ICP system. The source of sputtered atoms from the target is found through measurements of the depth of the sputter track in an eroded target and the distribution of the sputter flux is calculated via VFTRIM. A Monte Carlo routine tracks high energy atoms emerging from the target as they move through the chamber and undergo collisions with the electrons and background gas. The sputtered atoms are tracked by this routine whatever their electronic state (neutral, excited, or ion). If the energy of a sputtered atom decreases to near-thermal levels, then it exits the Monte Carlo routine as is tracked with a simple diffusion model. In this way, all sputtered atoms are followed until they hit and stick to a surface, and the velocity distribution of the sputtered atom population (including electronic state information) at each surface is calculated, especially the substrate. Through the use of this simulation the coil parameters and geometry can be tailored to maximize deposition rate and sputter flux uniformity.

  14. Experimental investigation of quasiperiodic-chaotic-quasiperiodic-chaotic transition in a direct current magnetron sputtering plasma

    Energy Technology Data Exchange (ETDEWEB)

    Sabavath, Gopi Kishan; Banerjee, I.; Mahapatra, S. K., E-mail: skmahapatra@bitmesra.ac.in [Plasma Laboratory, Department of Physics, Birla Institute of Technology-Mesra, Ranchi 835215 (India); Shaw, Pankaj Kumar; Sekar Iyengar, A. N. [Plasma Physics Division, Saha Institute of Nuclear Physics, 1/AF, Bidhannagar, Kolkata 700064 (India)

    2015-08-15

    Floating potential fluctuations from a direct current magnetron sputtering plasma have been analysed using time series analysis techniques like phase space plots, power spectra, frequency bifurcation plot, etc. The system exhibits quasiperiodic-chaotic-quasiperiodic-chaotic transitions as the discharge voltage was increased. The transitions of the fluctuations, quantified using the largest Lyapunov exponent, have been corroborated by Hurst exponent and the Shannon entropy. The Shannon entropy is high for quasiperiodic and low for chaotic oscillations.

  15. RP and RQA Analysis for Floating Potential Fluctuations in a DC Magnetron Sputtering Plasma

    Science.gov (United States)

    Sabavath, Gopikishan; Banerjee, I.; Mahapatra, S. K.

    2016-04-01

    The nonlinear dynamics of a direct current magnetron sputtering plasma is visualized using recurrence plot (RP) technique. RP comprises the recurrence quantification analysis (RQA) which is an efficient method to observe critical regime transitions in dynamics. Further, RQA provides insight information about the system’s behavior. We observed the floating potential fluctuations of the plasma as a function of discharge voltage by using Langmuir probe. The system exhibits quasi-periodic-chaotic-quasi-periodic-chaotic transitions. These transitions are quantified from determinism, Lmax, and entropy of RQA. Statistical investigations like kurtosis and skewness also studied for these transitions which are in well agreement with RQA results.

  16. Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Yang, Yuchen [State Key Lab for Materials Processing and Die & Mold Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States); Zhou, Xue [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States); Department of Electrical Engineering, Harbin Institute of Technology, Harbin 150000 (China); Liu, Jason X. [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States); Department of Physics, University of California, Berkeley, Berkeley, California 94720 (United States); Anders, André, E-mail: aanders@lbl.gov [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States)

    2016-01-18

    We present evidence for breathing modes in magnetron sputtering plasmas: periodic axial variations of plasma parameters with characteristic frequencies between 10 and 100 kHz. A set of azimuthally distributed probes shows synchronous oscillations of the floating potential. They appear most clearly when considering the intermediate current regime in which the direction of azimuthal spoke motion changes. Breathing oscillations were found to be superimposed on azimuthal spoke motion. Depending on pressure and current, one can also find a regime of chaotic fluctuations and one of stable discharges, the latter at high current. A pressure-current phase diagram for the different situations is proposed.

  17. Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    XUJun,GAOPeng; DINGWan-yu; LIXin; DENGXin-lu; DONGChuang

    2004-01-01

    Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transtorm infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C-N type.

  18. Effect of Wall Material on H– Production in a Plasma Sputter-Type Ion Source

    Directory of Open Access Journals (Sweden)

    Y. D. M. Ponce

    2004-12-01

    Full Text Available The effect of wall material on negative hydrogen ion (H– production was investigated in a multicusp plasma sputter-type ion source (PSTIS. Steady-state cesium-seeded hydrogen plasma was generated by a tungsten filament, while H– was produced through surface production using a molybdenum sputter target. Plasma parameters and H– yields were determined from Langmuir probe and Faraday cup measurements, respectively. At an input hydrogen pressure of 1.2 mTorr and optimum plasma discharge parameters Vd = –90 V and Id = –2.25 A, the plasma parameters ne was highest and T–e was lowest as determined from Langmuir probe measurements. At these conditions, aluminum generates the highest ion current density of 0.01697 mA/cm2, which is 64% more than the 0.01085 mA/cm2 that stainless steel produces. The yield of copper, meanwhile, falls between the two materials at 0.01164 mA/cm2. The beam is maximum at Vt = –125 V. Focusing is achieved at VL = –70 V for stainless steel, Vt = –60 V for aluminum, and Vt = –50 V for copper. The results demonstrate that proper selection of wall material can greatly enhance the H– production of the PSTIS.

  19. Influence of bias on properties of carbon films deposited by MCECR plasma sputtering method

    Institute of Scientific and Technical Information of China (English)

    CAI Chang-long; DIAO Dong-feng; S.Miyake; T.Matsumoto

    2004-01-01

    The mirror-confinement-type electron cyclotron resonance(MCECR) plasma source has high plasma density and high electron temperature. It is quite useful in many plasma processing, and has been used for etching and thin-film deposition. The carbon films with 40 nm thickness were deposited by MCECR plasma sputtering method on Si, and the influence of substrate bias on the properties of carbon films was studied. The bonding structure of the film was analyzed by the X-ray photoelectron spectroscopy(XPS), the tribological properties were measured by the pin-on-disk(POD) tribometer, the nanohardness of the films was measured by the nanoindenter, and the deposition speed and the refractive index were measured by the ellipse meter. The better substrate bias was obtained, and the better properties of carbon films were obtained.

  20. Composite materials obtained by the ion-plasma sputtering of metal compound coatings on polymer films

    Science.gov (United States)

    Khlebnikov, Nikolai; Polyakov, Evgenii; Borisov, Sergei; Barashev, Nikolai; Biramov, Emir; Maltceva, Anastasia; Vereshchagin, Artem; Khartov, Stas; Voronin, Anton

    2016-01-01

    In this article, the principle and examples composite materials obtained by deposition of metal compound coatings on polymer film substrates by the ion-plasma sputtering method are presented. A synergistic effect is to obtain the materials with structural properties of the polymer substrate and the surface properties of the metal deposited coatings. The technology of sputtering of TiN coatings of various thicknesses on polyethylene terephthalate films is discussed. The obtained composites are characterized by X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy dispersive X-ray spectroscopy (EDX), atomic force microscopy (AFM), and scanning tunneling microscopy (STM) is shown. The examples of application of this method, such as receiving nanocomposite track membranes and flexible transparent electrodes, are considered.

  1. Sputter-cleaning of an aluminum alloy using a thermionically assisted triode plasma system

    Energy Technology Data Exchange (ETDEWEB)

    Hsieh, J.H., E-mail: jhhsieh@mail.mcut.edu.tw [Dept. of Materials Engineering, Ming Chi University of Technology, Taishan, Taipei 24301, Taiwan ROC (China); Center for Thin Film Technologies and Applications (CTFTA), Ming Chi University of Technology, Taishan, Taipei 24301, Taiwan, ROC (China); Li, C. [Dept. of Biomedical Engineering, National Yang Ming University, Taipei, Taiwan, ROC (China); Center for Thin Film Technologies and Applications (CTFTA), Ming Chi University of Technology, Taishan, Taipei 24301, Taiwan, ROC (China); Liu, S.J. [Dept. of Math. and Sci., National Taiwan Normal University, Linkou 244, Taiwan, ROC (China)

    2013-09-16

    Polished aluminum alloy (6061) samples were cleaned using Ar plasma in a diode or triode plasma system. By monitoring cathode current, the changes of surface state and removal (cleaning) rate were determined and compared based on various setup. A modified mathematical model, based on Berg's reactive sputtering model, is derived and proposed to simulate the cleaning process. The results show that it is possible to sputter-clean the substrate under a triode setup with low bias and high ion bombardment rate (i.e. −500 V, triode, 1.3 Pa). This triode cleaning process was comparable with high bias and high working pressure diode process (i.e. −2500 V, diode, 3.3 Pa). Cleaning with high energy particle bombardment can create rough surface in nano-scale, although with the similar efficiency. Also, according to the regressive fitting on the cathode current–time curve, it is found that the average secondary electron yield for the oxide compound is around 0.33 if the average secondary electron yield for aluminum metal is 0.1. - Highlights: • Plasma with various ion energies could be generated using a triode system. • A model was built to explain the plasma cleaning process. • The results are believed to be useful in cleaning precision metal parts. • Secondary electron yield could be estimated using the adopted approach. • By using a triode system, the surface roughness could be controlled as will.

  2. Study on re-sputtering during CN{sub x} film deposition through spectroscopic diagnostics of plasma

    Energy Technology Data Exchange (ETDEWEB)

    Liang, Peipei; Yang, Xu; Li, Hui; Cai, Hua [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Sun, Jian; Xu, Ning [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Shanghai Engineering Research Center of Ultra-Precision Optical Manufacturing, Fudan University, Shanghai 200433 (China); Wu, Jiada, E-mail: jdwu@fudan.edu.cn [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Shanghai Engineering Research Center of Ultra-Precision Optical Manufacturing, Fudan University, Shanghai 200433 (China); Engineering Research Center of Advanced Lighting Technology, Ministry of Education, Fudan University, Shanghai 200433 (China)

    2015-10-15

    A nitrogen-carbon plasma was generated during the deposition of carbon nitride (CN{sub x}) thin films by pulsed laser ablation of a graphite target in a discharge nitrogen plasma, and the optical emission of the generated nitrogen-carbon plasma was measured for the diagnostics of the plasma and the characterization of the process of CN{sub x} film deposition. The nitrogen-carbon plasma was recognized to contain various species including nitrogen molecules and molecular ions excited in the ambient N{sub 2} gas, carbon atoms and atomic ions ablated from the graphite target and CN radicals. The temporal evolution and spatial distribution of the CN emission and their dependence on the substrate bias voltage show two groups of CN radicals flying in opposite directions. One represents the CN radicals formed as the products of the reactions occurring in the nitrogen-carbon plasma, revealing the reactive deposition of CN{sub x} film due to the reactive expansion of the ablation carbon plasma in the discharge nitrogen plasma and the effective formation of gaseous CN radicals as precursors for CN{sub x} film growth. The other one represents the CN radicals re-sputtered from the growing CN{sub x} film by energetic plasma species, evidencing the re-sputtering of the growing film accompanying film growth. And, the re-sputtering presents ion-induced sputtering features.

  3. Particle-in-Cell/Test-Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges

    OpenAIRE

    Trieschmann, Jan; Schmidt, Frederik; Mussenbrock, Thomas

    2016-01-01

    The paper provides a tutorial to the conceptual layout of a self-consistently coupled Particle-In-Cell/Test-Particle model for the kinetic simulation of sputtering transport in capacitively coupled plasmas at low gas pressures. It explains when a kinetic approach is actually needed and which numerical concepts allow for the inherent nonequilibrium behavior of the charged and neutral particles. At the example of a generic sputtering discharge both the fundamentals of the applied Monte Carlo me...

  4. The influence of N2 flow rate on Ar and Ti Emission in high-pressure magnetron sputtering system plasma

    Science.gov (United States)

    How, Soo Ren; Nayan, Nafarizal; Lias, Jais

    2017-03-01

    For ionized physical vapor deposition (known as IPVD) technique, investigation on the ionization mechanism of titanium atoms is very important during the deposition of titanium nitride (TiN) thin film using reactive magnetron sputtering plasma. The introduction of nitrogen gas into the chamber discharge leads to modifications of plasma parameters and ionization mechanism of transition species. In this work, an investigation on the influence of nitrogen flow rate on spectrum properties of argon and titanium during the deposition process have been carried out. The experimental configuration consists of OES and structure of magnetron sputtering device with the turbo molecular pump. A high-pressure magnetron sputtering plasma was used as plasma discharge chamber with various flow rate of nitrogen gas. Optical emission spectroscopy (OES) measurements were employed as plasma diagnostics tool in magnetron sputtering plasma operated at relatively high pressure. OES is a non-invasive plasma diagnostics method and that can detect the atomic and ionic emission during plasma discharge. The flow rate of the Ar and N2 gas are controlled by mass flow controller. The changes of relative emission for both neutral and ionic of argon as well as titanium were observed using optical spectrometer when the nitrogen gas is introduced into the discharged chamber. We found that the titanium emission decreased very rapidly with the flow rate of nitrogen. In addition, the argon emission slightly decreased with the flow rate of nitrogen.

  5. Boron-rich plasma by high power impulse magnetron sputtering of lanthanum hexaboride

    Energy Technology Data Exchange (ETDEWEB)

    Oks, Efim M. [State University of Control Systems and Radioelectronics, Tomsk (Russian Federation); Anders, Andre [Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)

    2012-10-15

    Boron-rich plasmas have been obtained using a LaB{sub 6} target in a high power impulse sputtering (HiPIMS) system. The presence of {sup 10}B{sup +}, {sup 11}B{sup +}, Ar{sup 2+}, Ar{sup +}, La{sup 2+}, and La{sup +} and traces of La{sup 3+}, {sup 12}C{sup +}, {sup 14}N{sup +}, and {sup 16}O{sup +} have been detected using an integrated mass and energy spectrometer. Peak currents as low as 20 A were sufficient to obtain plasma dominated by {sup 11}B{sup +} from a 5 cm planar magnetron. The ion energy distribution function for boron exhibits an energetic tail extending over several 10 eV, while argon shows a pronounced peak at low energy (some eV). This is in agreement with models that consider sputtering (B, La) and gas supply (from background and 'recycling'). Strong voltage oscillations develop at high current, greatly affecting power dissipation and plasma properties.

  6. Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Centre for Quantum Technologies, National University of Singapore, 3 Science Drive 2, 117543 Singapore, Singapore; Andersson, Joakim; Ni, Pavel; Anders, Andre

    2013-07-17

    Excitation and ionization conditions in traveling ionization zones of high power impulse magnetron sputtering plasmas were investigated using fast camera imaging through interference filters. The images, taken in end-on and side on views using light of selected gas and target atom and ion spectral lines, suggest that ionization zones are regions of enhanced densities of electrons, and excited atoms and ions. Excited atoms and ions of the target material (Al) are strongly concentrated near the target surface. Images from the highest excitation energies exhibit the most localized regions, suggesting localized Ohmic heating consistent with double layer formation.

  7. Particle-in-Cell/Test-Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges

    CERN Document Server

    Trieschmann, Jan; Mussenbrock, Thomas

    2016-01-01

    The paper provides a tutorial to the conceptual layout of a self-consistently coupled Particle-In-Cell/Test-Particle model for the kinetic simulation of sputtering transport in capacitively coupled plasmas at low gas pressures. It explains when a kinetic approach is actually needed and which numerical concepts allow for the inherent nonequilibrium behavior of the charged and neutral particles. At the example of a generic sputtering discharge both the fundamentals of the applied Monte Carlo methods as well as the conceptual details in the context of the sputtering scenario are elaborated on. Finally, two in the context of sputtering transport simulations often exploited assumptions, namely on the energy distribution of impinging ions as well as on the test particle approach, are validated for the proposed example discharge.

  8. Deposition and sputtering yields on EUV collector mirror from Laser Plasma Extreme Ultraviolet Sources

    Energy Technology Data Exchange (ETDEWEB)

    Wu Tao [Wuhan National Laboratory for Optoelectronics, School of Optoelectronic Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Rao Zhiming [Depart of Computer Science, Jiangxi University of Traditional Chinese Medicine, Nanchang 330004, Jiangxi (China); Wang Shifang, E-mail: flatime@163.com [School of Physics and Electric Information, Hubei University of Education 1 Nanhuan Road, Wuhan East High-Tech. Zone, Wuhan 430205, Hubei (China)

    2011-02-01

    Based on the self-similar solution of gas dynamic equations, spherical expansion of the highly ionized plasma with limited mass into a vacuum is investigated for the droplet target laser-produced plasma extreme ultraviolet (LPP-EUV) sources. Using partially numerical and partially analytical technology, the velocity, the temperature and the density profiles in the plume versus ionization degree, adiabatic index and initial conditions are presented. Furthermore, the spatial thickness variations of the deposited substrate witness and ion sputtering yields for Ru, Mo, and Si under Sn ion bombardment are theoretically calculated, which can be useful to enable LPP-EUV sources suppliers to estimate collector lifetime and improve debris mitigation systems.

  9. Feasibility of arc-discharge and plasma-sputtering methods in cleaning plasma-facing and diagnostics components of fusion reactors

    Energy Technology Data Exchange (ETDEWEB)

    Hakola, Antti, E-mail: antti.hakola@vtt.fi [VTT Technical Research Centre of Finland, VTT (Finland); Likonen, Jari [VTT Technical Research Centre of Finland, VTT (Finland); Karhunen, Juuso; Korhonen, Juuso T. [Department of Applied Physics, Aalto University (Finland); Aints, Märt; Laan, Matti; Paris, Peeter [Department of Physics, University of Tartu (Estonia); Kolehmainen, Jukka; Koskinen, Mika; Tervakangas, Sanna [DIARC-Technology Oy, Espoo (Finland)

    2015-10-15

    Highlights: • Feasibility of the arc-discharge and plasma-sputtering techniques in removing deposited layers from ITER-relevant samples demonstrated. • Samples with the size of an A4 paper can be cleaned from 1-μm thick deposited layers in 10–20 minutes by the arc-discharge method. • The plasma-sputtering method is 5–10 times slower but the resulting surfaces are very smooth. • Arc-discharge method could be used for rapid cleaning of plasma-facing components during maintenance shutdowns of ITER, plasma sputtering is preferred for diagnostics mirrors. - Abstract: We have studied the feasibility of arc-discharge and plasma-sputtering methods in removing deposited layers from ITER-relevant test samples. Prototype devices have been designed and constructed for the experiments and the cleaning process is monitored by a spectral detection system. The present version of the arc-discharge device is capable of removing 1-μm thick layers from 350-mm{sup 2} areas in 4–8 s, but due to the increased roughness of the cleaned surfaces and signs of local melting, mirror-like surfaces cannot be treated by this technique. The plasma-sputtering approach, for its part, is some 5–10 times slower in removing the deposited layers but no changes in surface roughness or morphology of the samples could be observed after the cleaning phase. The arc-discharge technique could therefore be used for rapid cleaning of plasma-facing components during maintenance shutdowns of ITER while in the case of diagnostics mirrors plasma sputtering is preferred.

  10. Plasma polymer-functionalized silica particles for heavy metals removal.

    Science.gov (United States)

    Akhavan, Behnam; Jarvis, Karyn; Majewski, Peter

    2015-02-25

    Highly negatively charged particles were fabricated via an innovative plasma-assisted approach for the removal of heavy metal ions. Thiophene plasma polymerization was used to deposit sulfur-rich films onto silica particles followed by the introduction of oxidized sulfur functionalities, such as sulfonate and sulfonic acid, via water-plasma treatments. Surface chemistry analyses were conducted by X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectroscopy. Electrokinetic measurements quantified the zeta potentials and isoelectric points (IEPs) of modified particles and indicated significant decreases of zeta potentials and IEPs upon plasma modification of particles. Plasma polymerized thiophene-coated particles treated with water plasma for 10 min exhibited an IEP of less than 3.5. The effectiveness of developed surfaces in the adsorption of heavy metal ions was demonstrated through copper (Cu) and zinc (Zn) removal experiments. The removal of metal ions was examined through changing initial pH of solution, removal time, and mass of particles. Increasing the water plasma treatment time to 20 min significantly increased the metal removal efficiency (MRE) of modified particles, whereas further increasing the plasma treatment time reduced the MRE due to the influence of an ablation mechanism. The developed particulate surfaces were capable of removing more than 96.7% of both Cu and Zn ions in 1 h. The combination of plasma polymerization and oxidative plasma treatment is an effective method for the fabrication of new adsorbents for the removal of heavy metals.

  11. Modification of polylactic acid surface using RF plasma discharge with sputter deposition of a hydroxyapatite target for increased biocompatibility

    Energy Technology Data Exchange (ETDEWEB)

    Tverdokhlebov, S.I., E-mail: tverd@tpu.ru [Tomsk Polytechnic University, 30 Lenin Avenue, Tomsk 634050 (Russian Federation); Bolbasov, E.N.; Shesterikov, E.V. [Tomsk Polytechnic University, 30 Lenin Avenue, Tomsk 634050 (Russian Federation); Antonova, L.V.; Golovkin, A.S.; Matveeva, V.G. [Federal State Budgetary Institution Research Institute for Complex Issues of Cardiovascular Disease, 6 Sosnovy Blvd, Kemerovo 650002 (Russian Federation); Petlin, D.G.; Anissimov, Y.G. [Griffith University, School of Natural Sciences, Engineering Dr., Southport, QLD 4222 (Australia)

    2015-02-28

    Highlights: • The treatment by plasma of radio-frequency magnetron discharge with hydroxyapatite target sputtering improves the biocompatibility of PLLA surface. • The treatment significantly increases the roughness of PLLA surface. • The formation of rough highly porous surface is due to the etching and crystallization processes on PLLA surface during treatment. • Maximum concentration of the ions from the sputtered target is achieved at 60 s of the plasma treatment. - Abstract: Surface modification of polylactic acid (PLLA) by plasma of radio-frequency magnetron discharge with hydroxyapatite target sputtering was investigated. Increased biocompatibility was demonstrated using studies with bone marrow multipotent mesenchymal stromal cells. Atomic force microscopy demonstrates that the plasma treatment modifies the surface morphology of PLLA to produce rougher surface. Infrared spectroscopy and X-ray diffraction revealed that changes in the surface morphology are caused by the processes of PLLA crystallization. Fluorescent X-ray spectroscopy showed that the plasma treatment also changes the chemical composition of PLLA, enriching it with ions of the sputtered target: calcium, phosphorus and oxygen. It is hypothesized that these surface modifications increase biocompatibility of PLLA without increasing toxicity.

  12. Plasma analysis of inductively coupled impulse sputtering of Cu, Ti and Ni

    Science.gov (United States)

    Loch, D. A. L.; Aranda Gonzalvo, Y.; Ehiasarian, A. P.

    2017-06-01

    Inductively coupled impulse sputtering (ICIS) is a new development in the field of highly ionised pulsed PVD processes. For ICIS the plasma is generated by an internal inductive coil, replacing the need for a magnetron. To understand the plasma properties, measurements of the current and voltage waveforms at the cathode were conducted. The ion energy distribution functions (IEDFs) were measured by energy resolved MS and plasma chemistry was analysed by OES and then compared to a model. The target was operated in pulsed DC mode and the coil was energised by pulsed RF power, with a duty cycle of 7.5%. At a constant pressure (14 Pa) the set peak RF power was varied from 1000-4000 W. The DC voltage to the target was kept constant at 1900 V. OES measurements have shown a monotonic increase in intensity with increasing power. Excitation and ionisation processes were single step for ICIS of Ti and Ni and multi-step for Cu. The latter exhibited an unexpectedly steep rise in ionisation efficiency with power. The IEDFs measured by MS show the material- and time-dependant plasma potential in the range of 10-30 eV, ideal for increased surface mobility without inducing lattice defects. A lower intensity peak, of high energetic ions, is visible at 170 eV during the pulse.

  13. Parameter Study of Plasma-Induced Atmospheric Sputtering and Heating at Mars

    Science.gov (United States)

    Williamson, Hayley N.; Johnson, Robert E.; Leblanc, Francois

    2014-11-01

    Atoms and molecules in Mars’ upper atmosphere are lost predominately through sputtering, caused by the impact of ions into the exosphere, dissociative recombination, and thermal escape. While all three processes are thought to occur on Mars, a detailed understanding must ascertain the relative importance of each process, due to time variations in pick-up and solar wind ions. In this project, using case studies of an oxygen atmosphere modeled with Direct Simulation Monte Carlo techniques, we have endeavored to categorize when the momentum transfer or thermal escape is more likely to occur. To do this, we vary the incident plasma flux and energy based on models of the interaction of the solar wind with the Martian atmosphere. We first repeat the heating and sputtering rates due to a flux of pick-up O+ examined previously (Johnson et al. 2000; Michael and Johnson 2005; Johnson et al 2013). We have used multiple examples of particle fluxes for various solar wind conditions, from steady solar wind conditions (Luhmann et al. 1992; Chaufray et al. 2007) to more extreme cases (Fang et al. 2013; Wang et al. 2014), which are thought to increase escape by several orders of magnitude. The goal is to explore the escape parameter space in preparation for the expected data from MAVEN on hot atoms and molecules in the Martian exosphere.

  14. Comparative study of nanocomposites prepared by pulsed and dc sputtering combined with plasma polymerization suitable for photovoltaic device applications

    Energy Technology Data Exchange (ETDEWEB)

    Hussain, Amreen A. [Physical Sciences Division, Institute of Advanced Study in Science and Technology, Guwahati, Assam (India); Pal, Arup R., E-mail: arpal@iasst.gov.in [Physical Sciences Division, Institute of Advanced Study in Science and Technology, Guwahati, Assam (India); Kar, Rajib [Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai (India); Bailung, Heremba; Chutia, Joyanti [Physical Sciences Division, Institute of Advanced Study in Science and Technology, Guwahati, Assam (India); Patil, Dinkar S. [Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai (India)

    2014-12-15

    Plasma processing, a single step method for production of large area composite films, is employed to deposit plasma polymerized aniline-Titanium dioxide (PPani-TiO{sub 2}) nanocomposite thin films. The deposition of PPani-TiO{sub 2} nanocomposite films are made using reactive magnetron sputtering and plasma polymerization combined process. This study focuses on the direct comparison between continuous and pulsed dc magnetron sputtering techniques of titanium in combination with rf plasma polymerization of aniline. The deposited PPani-TiO{sub 2} nanocomposite films are characterized and discussed in terms of structural, morphological and optical properties. A self powered hybrid photodetector has been developed by plasma based process. The proposed method provides a new route where the self-assembly of molecules, that is, the spontaneous association of atomic or molecular building blocks under plasma environment, emerge as a successful strategy to form well-defined structural and morphological units of nanometer dimensions. - Highlights: • PPani-TiO{sub 2} nanocomposite by pulsed and dc sputtering with rf plasma polymerization. • In-situ and Ex-situ H{sub 2}SO{sub 4} doping in PPani-TiO{sub 2} nanocomposite. • PPani-TiO{sub 2} nanocomposite based self-powered-hybrid photodetector.

  15. Performance of plasma sputtered fuel cell electrodes with ultra-low Pt loadings

    Energy Technology Data Exchange (ETDEWEB)

    Cavarroc, M.; Ennadjaoui, A. [MID Dreux Innovation, CAdD, 4 Rue Albert Caquot-28500 Vernouillet (France); Mougenot, M.; Brault, P.; Escalier, R.; Tessier, Y. [Groupe de Recherches sur l' Energetique des Milieux Ionises, CNRS Universite d' Orleans, BP6744, 14 rue d' Issoudun, 45067 Orleans (France); Durand, J.; Roualdes, S. [Institut Europeen des Membranes, ENSCM, UM2, CNRS, Universite Montpellier 2, CC047, Place Eugene Bataillon, 34095 Montpellier cedex 5 (France); Sauvage, T. [Conditions Extremes et Materiaux, Haute Temperature et Irradiation, UPR3079 CNRS, Site Cyclotron, 3A rue de la Ferollerie, 45071 Orleans Cedex 2 (France); Coutanceau, C. [Laboratoire de Catalyse en Chimie Organique, UMR6503 Universite de Poitiers, CNRS, 86022, Poitiers (France)

    2009-04-15

    Ultra-low Pt content PEMFC electrodes have been manufactured using magnetron co-sputtering of carbon and platinum on a commercial E-Tek {sup registered} uncatalyzed gas diffusion layer in plasma fuel cell deposition devices. Pt loadings of 0.16 and 0.01 mg cm{sup -2} have been realized. The Pt catalyst is dispersed as small clusters with size less than 2 nm over a depth of 500 nm. PEMFC test with symmetric electrodes loaded with 10 {mu}g cm{sup -2} led to maximum reproducible power densities as high as 0.4 and 0.17 W cm{sup -2} with Nafion {sup registered} 212 and Nafion {sup registered} 115 membranes, respectively. (author)

  16. Plasma potential of a moving ionization zone in DC magnetron sputtering

    Science.gov (United States)

    Panjan, Matjaž; Anders, André

    2017-02-01

    Using movable emissive and floating probes, we determined the plasma and floating potentials of an ionization zone (spoke) in a direct current magnetron sputtering discharge. Measurements were recorded in a space and time resolved manner, which allowed us to make a three-dimensional representation of the plasma potential. From this information we could derive the related electric field, space charge, and the related spatial distribution of electron heating. The data reveal the existence of strong electric fields parallel and perpendicular to the target surface. The largest E-fields result from a double layer structure at the leading edge of the ionization zone. We suggest that the double layer plays a crucial role in the energization of electrons since electrons can gain several 10 eV of energy when crossing the double layer. We find sustained coupling between the potential structure, electron heating, and excitation and ionization processes as electrons drift over the magnetron target. The brightest region of an ionization zone is present right after the potential jump, where drifting electrons arrive and where most local electron heating occurs. The ionization zone intensity decays as electrons continue to drift in the Ez × B direction, losing energy by inelastic collisions; electrons become energized again as they cross the potential jump. This results in the elongated, arrowhead-like shape of the ionization zone. The ionization zone moves in the -Ez × B direction from which the to-be-heated electrons arrive and into which the heating region expands; the zone motion is dictated by the force of the local electric field on the ions at the leading edge of the ionization zone. We hypothesize that electron heating caused by the potential jump and physical processes associated with the double layer also apply to magnetrons at higher discharge power, including high power impulse magnetron sputtering.

  17. Kinetic and Potential Sputtering of Lunar Regolith: The Contribution of the Heavy Highly Charged (Minority) Solar Wind Ions

    Science.gov (United States)

    Meyer, F. W.; Barghouty, A. F.

    2012-01-01

    Solar wind sputtering of the lunar surface helps determine the composition of the lunar exosphere and contributes to surface weathering. To date, only the effects of the two dominant solar wind constituents, H+ and He+, have been considered. The heavier, less abundant solar wind constituents have much larger sputtering yields because they have greater mass (kinetic sputtering) and they are highly charged (potential sputtering) Their contribution to total sputtering can therefore be orders of magnitude larger than their relative abundances would suggest

  18. Analyses of the plasma generated by laser irradiation on sputtered target for determination of the thickness used for plasma generation

    Energy Technology Data Exchange (ETDEWEB)

    Kumaki, Masafumi, E-mail: masafumi.kumaki@riken.jp [Cooperative Major in Nuclear Energy, Waseda University, Shinjuku, Tokyo (Japan); RIKEN, Wako, Saitama (Japan); Ikeda, Shunsuke; Sekine, Megumi; Munemoto, Naoya [RIKEN, Wako, Saitama (Japan); Department of Energy Sciences, Tokyo Institute of Technology, Meguro, Tokyo (Japan); Fuwa, Yasuhiro [RIKEN, Wako, Saitama (Japan); Department of Physics and Astronomy, Kyoto University, Uji, Kyoto (Japan); Cinquegrani, David [American Nuclear Society, University of Michigan, Ann Arbor, Michigan 48109 (United States); Kanesue, Takeshi; Okamura, Masahiro [Collider-Accelerator Department, Brookhaven National Laboratory, Upton, New York 11973 (United States); Washio, Masakazu [Cooperative Major in Nuclear Energy, Waseda University, Shinjuku, Tokyo (Japan)

    2014-02-15

    In Brookhaven National Laboratory, laser ion source has been developed to provide heavy ion beams by using plasma generation with 1064 nm Nd:YAG laser irradiation onto solid targets. The laser energy is transferred to the target material and creates a crater on the surface. However, only the partial material can be turned into plasma state and the other portion is considered to be just vaporized. Since heat propagation in the target material requires more than typical laser irradiation period, which is typically several ns, only the certain depth of the layers may contribute to form the plasma. As a result, the depth is more than 500 nm because the base material Al ions were detected. On the other hand, the result of comparing each carbon thickness case suggests that the surface carbon layer is not contributed to generate plasma.

  19. Modification of polylactic acid surface using RF plasma discharge with sputter deposition of a hydroxyapatite target for increased biocompatibility

    Science.gov (United States)

    Tverdokhlebov, S. I.; Bolbasov, E. N.; Shesterikov, E. V.; Antonova, L. V.; Golovkin, A. S.; Matveeva, V. G.; Petlin, D. G.; Anissimov, Y. G.

    2015-02-01

    Surface modification of polylactic acid (PLLA) by plasma of radio-frequency magnetron discharge with hydroxyapatite target sputtering was investigated. Increased biocompatibility was demonstrated using studies with bone marrow multipotent mesenchymal stromal cells. Atomic force microscopy demonstrates that the plasma treatment modifies the surface morphology of PLLA to produce rougher surface. Infrared spectroscopy and X-ray diffraction revealed that changes in the surface morphology are caused by the processes of PLLA crystallization. Fluorescent X-ray spectroscopy showed that the plasma treatment also changes the chemical composition of PLLA, enriching it with ions of the sputtered target: calcium, phosphorus and oxygen. It is hypothesized that these surface modifications increase biocompatibility of PLLA without increasing toxicity.

  20. Vehicle Exhaust Gas Clearance by Low Temperature Plasma-Driven Nano-Titanium Dioxide Film Prepared by Radiofrequency Magnetron Sputtering

    OpenAIRE

    Shuang Yu; Yongdong Liang; Shujun Sun; Kai Zhang; Jue Zhang; Jing Fang

    2013-01-01

    A novel plasma-driven catalysis (PDC) reactor with special structure was proposed to remove vehicle exhaust gas. The PDC reactor which consisted of three quartz tubes and two copper electrodes was a coaxial dielectric barrier discharge (DBD) reactor. The inner and outer electrodes firmly surrounded the outer surface of the corresponding dielectric barrier layer in a spiral way, respectively. Nano-titanium dioxide (TiO2) film prepared by radiofrequency (RF) magnetron sputtering was coated on t...

  1. Exploring the potential of remote plasma sputtering for the production of L10 ordered FePt thin films

    Science.gov (United States)

    Zygridou, S.; Barton, C. W.; Nutter, P. W.; Thomson, T.

    2017-07-01

    Lowering the temperature at which the desirable L10 phase forms in FePt thin films is a key requirement in the development of next generation high-density data storage media and spintronic devices. Remote plasma sputtering offers a higher degree of control over the sputtering parameters, allowing the properties of films to be tailored, and potentially can affect the ordering kinetics of the L10 phase of FePt. Here, we report a comprehensive study of FePt thin films deposited under a range of temperatures and sputtering conditions. X-ray diffraction and magnetometry investigations show that whilst FePt thin films ordered in the L10 phase with high perpendicular anisotropy can be produced using this technique, there is no significant reduction in the required ordering temperature compared with films produced using conventional DC sputtering. Optimally ordered L10 FePt films were fabricated when the film was deposited at a substrate temperature of 200 °C, followed by post annealing at 750 °C.

  2. Particle beam experiments for the investigation of plasma-surface interactions: application to magnetron sputtering and polymer treatment

    CERN Document Server

    Corbella, Carles; Kreiter, Oliver; Arcos, Teresa de los; Benedikt, Jan; von Keudell, Achim

    2013-01-01

    A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions. Atom and ion beams are focused onto the sample to expose it to quantified beams of oxygen, nitrogen, hydrogen, noble gas ions and metal vapor. The heterogeneous surface processes are monitored in-situ and in real time by means of a quartz crystal microbalance (QCM) and Fourier transform infrared spectroscopy (FTIR). Two examples illustrate the capabilities of the particle beam setup: oxidation and nitriding of aluminum as a model of target poisoning during reactive magnetron sputtering, and plasma treatment of polymers (PET, PP).

  3. Heavy Neutral Beam Probe for Edge Plasma Analysis in Tokamaks

    Energy Technology Data Exchange (ETDEWEB)

    Castracane, J.

    2001-01-04

    The Heavy Neutral Beam Probe (HNBP) developed initially with DOE funding under the Small Business Innovation Research (SBIR) program was installed on the Tokamak de Varennes (TdeV) at the CCFM. This diagnostic was designed to perform fundamental measurements of edge plasma properties. The hardware was capable of measuring electron density and potential profiles with high spatial and temporal resolution. Fluctuation spectra for these parameters were obtained with HNBP for transport studies.

  4. Validity of “sputtering and re-condensation” model in active screen cage plasma nitriding process

    Energy Technology Data Exchange (ETDEWEB)

    Saeed, A., E-mail: phyadi@gmail.com [Department of Physics, Gomal University, 29050 D.I. Khan (Pakistan); National Centre for Physics, Quaid-i-Azam University Campus Islamabad 45320 (Pakistan); Khan, A.W. [Department of Physics, Gomal University, 29050 D.I. Khan (Pakistan); National Centre for Physics, Quaid-i-Azam University Campus Islamabad 45320 (Pakistan); Jan, F. [Department of Physics, Quaid-i-Azam University, 45320 Islamabad (Pakistan); Abrar, M. [Institute of Physics and Electronics, University of Peshawar, 25120 Peshawar (Pakistan); Khalid, M. [Department of Physics, Gomal University, 29050 D.I. Khan (Pakistan); Zakaullah, M. [Department of Physics, Quaid-i-Azam University, 45320 Islamabad (Pakistan)

    2013-05-15

    The validity of “sputtering and re-condensation” model in active screen plasma nitriding for nitrogen mass transfer mechanism is investigated. The dominant species including NH, Fe-I, N{sub 2}{sup +}, N-I and N{sub 2} along with H{sub α} and H{sub β} lines are observed in the optical emission spectroscopy (OES) analysis. Active screen cage and dc plasma nitriding of AISI 316 stainless steel as function of treatment time is also investigated. The structure and phases composition of the nitrided layer is studied by X-ray diffraction (XRD). Surface morphology is studied by scanning electron microscopy (SEM) and hardness profile is obtained by Vicker's microhardness tester. Increasing trend in microhardness is observed in both cases but the increase in active screen plasma nitriding is about 3 times greater than that achieved by dc plasma nitriding. On the basis of metallurgical and OES observations the use of “sputtering and re-condensation” model in active screen plasma nitriding is tested.

  5. Swift heavy ion induced optical and structural modifications in RF sputtered nanocrystalline ZnO thin film

    Science.gov (United States)

    Singh, S. K.; Singhal, R.; Vishnoi, R.; Kumar, V. V. S.; Kulariya, P. K.

    2017-01-01

    In the present study, 100 MeV Ag7+ ion beam-induced structural and optical modifications of nanocrystalline ZnO thin films are investigated. The nanocrystalline ZnO thin films are grown using radio frequency magnetron sputtering and irradiated at fluences of 3 × 1012, 1 × 1013 and 3 × 1013 ions/cm2. The incident swift heavy ions induced change in the crystallinity together with the preferential growth of crystallite size along the c axis (002) orientation. The average crystallite size is found to be increased from 10.8 ± 0.7 to 20.5 ± 0.3 nm with increasing the ion fluence. The Atomic force microscopy analysis confirms the variation in the surface roughness by varying the incident ion fluences. The UV-visible spectroscopy shows the decrement in transmittance of the film with ion irradiation. The micro-Raman spectra of ZnO thin films are investigated to observe ion-induced modifications which support the increased lattice defects with higher fluence. The variation in crystallinity indicates that ZnO-based devices can be used in piezoelectric transduction mechanism.

  6. Enhancement of the crystalline Ge film growth by inductively coupled plasma-assisted pulsed DC sputtering.

    Science.gov (United States)

    Kim, Eunkyeom; Han, Seung-Hee

    2014-11-01

    The effect of pulsed DC sputtering on the crystalline growth of Ge thin film was investigated. Ge thin films were deposited on the glass substrates using ICP-assisted pulsed DC sputtering. The Ge target was sputtered using asymmetric bipolar pulsed DC sputtering system with and without assistance of ICP source. The pulse frequency of 200 Hz and the pulse on time of 500 μsec (duty cycle = 10%) were kept during sputtering process. Crystal structures were studied from X-ray diffraction. The X-ray diffraction patterns clearly showed crystalline film structures. The Ge thin films with randomly oriented crystalline were obtained using pulsed DC sputtering without ICP, whereas they had well aligned (220) orientation crystalline using ICP source. Moreover, the combination of ICP assistance and pulsed DC sputtering enhanced the growth of crystalline Ge thin films without hydrogen and metal by in situ deposition. The structure and lattice of the films were studied from TEM images. The cross-sectional TEM images revealed the deposited Ge films with columnar structure.

  7. Sputtering yields and surface chemical modification of tin-doped indium oxide in hydrocarbon-based plasma etching

    Energy Technology Data Exchange (ETDEWEB)

    Li, Hu; Karahashi, Kazuhiro; Hamaguchi, Satoshi, E-mail: hamaguch@ppl.eng.osaka-u.ac.jp [Center for Atomic and Molecular Technologies, Osaka University, Yamadaoka 2-1, Suita 565-0871 (Japan); Fukasawa, Masanaga; Nagahata, Kazunori; Tatsumi, Tetsuya [Device and Material R& D Group, RDS Platform, Sony Corporation, Kanagawa 243-0014 (Japan)

    2015-11-15

    Sputtering yields and surface chemical compositions of tin-doped indium oxide (or indium tin oxide, ITO) by CH{sup +}, CH{sub 3}{sup +}, and inert-gas ion (He{sup +}, Ne{sup +}, and Ar{sup +}) incidence have been obtained experimentally with the use of a mass-selected ion beam system and in-situ x-ray photoelectron spectroscopy. It has been found that etching of ITO is chemically enhanced by energetic incidence of hydrocarbon (CH{sub x}{sup +}) ions. At high incident energy incidence, it appears that carbon of incident ions predominantly reduce indium (In) of ITO and the ITO sputtering yields by CH{sup +} and CH{sub 3}{sup +} ions are found to be essentially equal. At lower incident energy (less than 500 eV or so), however, a hydrogen effect on ITO reduction is more pronounced and the ITO surface is more reduced by CH{sub 3}{sup +} ions than CH{sup +} ions. Although the surface is covered more with metallic In by low-energy incident CH{sub 3}{sup +} ions than CH{sup +} ions and metallic In is in general less resistant against physical sputtering than its oxide, the ITO sputtering yield by incident CH{sub 3}{sup +} ions is found to be lower than that by incident CH{sup +} ions in this energy range. A postulation to account for the relation between the observed sputtering yield and reduction of the ITO surface is also presented. The results presented here offer a better understanding of elementary surface reactions observed in reactive ion etching processes of ITO by hydrocarbon plasmas.

  8. Ferroelectric Plasma Source for Heavy Ion Beam Charge Neutralization

    CERN Document Server

    Efthimion, Philip; Gilson, Erik P; Grisham, Larry; Logan, B G; Waldron, William; Yu, Simon

    2005-01-01

    Plasmas are employed as a medium for charge neutralizing heavy ion beams to allow them to focus to a small spot size. Calculations suggest that plasma at a density of 1-100 times the ion beam density and at a length ~ 0.1-1 m would be suitable. To produce 1 meter plasma, large-volume plasma sources based upon ferroelectric ceramics are being considered. These sources have the advantage of being able to increase the length of the plasma and operate at low neutral pressures. The source will utilize the ferroelectric ceramic BaTiO3 to form metal plasma. The drift tube inner surface of the Neutralized Drift Compression Experiment (NDCX) will be covered with ceramic. High voltage (~ 1-5 kV) is applied between the drift tube and the front surface of the ceramic by placing a wire grid on the front surface. A prototype ferroelectric source 20 cm long produced plasma densities ~ 5x1011 cm-3. The source was integrated into the experiment and successfully charge neutralized the K ion beam. Presently, the 1 meter source ...

  9. Adhesion of NiCu Films DC Biased Plasma-Sputter-Deposited on MgO (001)

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    NiCu films about 60nm thick were deposited on MgO (001) substrates at 230℃ by DC plasma-sputtering at 2.7kV and 8mA in pure Ar gas using a Ni90Cu10 target. A DC bias voltage of 0, 60, 110 or 140V was applied to the substrate during deposition. The adhesion of the film to the substrate was studied using a scratch test as a function of . The application of is very effective in increasing the adhesion of the film to the substrate. In conclusion, the adhesion increases with cleaning the substrate surface by sputtering off impurity admolecules during the film initial formation due to the energetic Ar ion particle bombardment.

  10. Effect of nitrogen-containing plasma on adherence, friction, and wear of radiofrequency-sputtered titanium carbide coatings

    Science.gov (United States)

    Brainard, W. A.; Wheeler, D. R.

    1979-01-01

    Friction and wear experiments on 440C steel surfaces that were rf sputtered with titanium carbide when a small percentage of nitrogen was added to the plasma were conducted. Both X-ray photoelectron spectroscopy and X-ray diffraction were used to analyze the resultant coatings. Results indicate that the small partial pressure of nitrogen (approximately 0.5 percent) markedly improves the adherence, friction, and wear properties when compared with coatings applied to sputter-etched surfaces, oxidized surfaces, or in the presence of a small oxygen partial pressure. The improvements are related to the formation of an interface containing a mixture of the nitrides of titanium and iron, which are harder than their corresponding oxides.

  11. Use of a nitrogen-argon plasma to improve adherence of sputtered titanium carbide coatings on steel

    Science.gov (United States)

    Brainard, W. A.; Wheeler, D. R.

    1979-01-01

    Friction and wear experiments on 440-C steel surfaces that had been RF-sputtered with titanium carbide when a small percentage of nitrogen was added to the plasma were conducted. X-ray photoelectron spectroscopy and X-ray diffraction were used to analyze the resultant coatings. Results indicate that a small partial pressure of nitrogen (about 0.5%) markedly improves the adherence, friction, and wear properties when compared with coatings applied on sputter-etched oxidized surfaces or in the presence of a small oxygen partial pressure. The improvements are related to the formation of an interface containing a mixture of the nitrides of titanium and iron, which are harder than their corresponding oxides.

  12. Properties of Erbium Doped Hydrogenated Amorphous Carbon Layers Fabricated by Sputtering and Plasma Assisted Chemical Vapor Deposition

    Directory of Open Access Journals (Sweden)

    V. Prajzler

    2008-01-01

    Full Text Available We report about properties of carbon layers doped with Er3+ ions fabricated by Plasma Assisted Chemical Vapor Deposition (PACVD and by sputtering on silicon or glass substrates. The structure of the samples was characterized by X-ray diffraction and their composition was determined by Rutherford Backscattering Spectroscopy and Elastic Recoil Detection Analysis. The Absorbance spectrum was taken in the spectral range from 400 nm to 600 nm. Photoluminescence spectra were obtained using two types of Ar laser (λex=514.5 nm, lex=488 nm and also using a semiconductor laser (λex=980 nm. Samples fabricated by magnetron sputtering exhibited typical emission at 1530 nm when pumped at 514.5 nm. 

  13. BN/BNSiO2 sputtering yield shape profiles under stationary plasma thruster operating conditions

    Directory of Open Access Journals (Sweden)

    M. Ranjan

    2016-09-01

    Full Text Available Quartz Crystal Microbalance (QCM is used to measure the volumetric and total sputtering yield of Boron Nitride (BN and Boron Nitride Silicon Dioxide (BNSiO2 bombarded by Xenon ions in the energy range of 100 eV to 550 eV. Sputtering yield shape profiles are reported at various angles of incidence 0-85° with surface normal and compared with modified Zhang model. The yield shape profile is found to be symmetric at normal incidence and asymmetric at oblique incidence. Both the materials show a sudden jump in the sputtering yield above 500 eV and at an angle of incidence in the range of 45-65°. Erosion of BN at as low as 74 eV ion energy is predicted using generalized Bohdansky model. BNSiO2 show a marginally higher sputtering yield compare to BN.

  14. Influence of plasma parameters on the growth and properties of magnetron sputtered CNx thin films

    Science.gov (United States)

    Hellgren, Niklas; Macák, Karol; Broitman, Esteban; Johansson, Mats P.; Hultman, Lars; Sundgren, Jan-Eric

    2000-07-01

    Carbon nitride CNx thin films were grown by unbalanced dc magnetron sputtering from a graphite target in a pure N2 discharge, and with the substrate temperature Ts kept between 100 and 550 °C. A solenoid coil positioned in the vicinity of the substrate was used to support the magnetic field of the magnetron, so that the plasma could be increased near the substrate. By varying the coil current and gas pressure, the energy distribution and fluxes of N2+ ions and C neutrals could be varied independently of each other over a wide range. An array of Langmuir probes in the substrate position was used to monitor the radial ion flux distribution over the 75-mm-diam substrate, while the flux and energy distribution of neutrals was estimated through Monte Carlo simulations. The structure, surface roughness, and mechanical response of the films are found to be strongly dependent on the substrate temperature, and the fluxes and energies of the deposited particles. By controlling the process parameters, the film structure can thus be selected to be amorphous, graphite-like or fullerene-like. When depositing at 3 mTorr N2 pressure, with Ts>200 °C, a transition from a disordered graphite-like to a hard and elastic fullerene-like structure occurred when the ion flux was increased above ˜0.5-1.0 mA/cm2. The nitrogen-to-carbon concentration ratio in the films ranged from ˜0.1 to 0.65, depending on substrate temperature and gas pressure. The nitrogen film concentration did, however, not change when varying the nitrogen ion-to-carbon atom flux ratios from ˜1 to 20.

  15. Photocatalytic property of titanium dioxide thin films deposited by radio frequency magnetron sputtering in argon and water vapour plasma

    Energy Technology Data Exchange (ETDEWEB)

    Sirghi, L., E-mail: lsirghi@uaic.ro [Department of Physics, Alexandru Ioan Cuza University, Blvd. Carol I, 11, Iasi, 700506 (Romania); Hatanaka, Y. [Research Institute of Electronics, Shizuoka University, 3-5-1, Johoku Naka-ku Hamamatsu, 432-8011 (Japan); Sakaguchi, K. [Faculty of Engineering, Aichi University of Technology, 50-2 Manori, Nishihazama, Gamagori, 443-0047 Aichi (Japan)

    2015-10-15

    Highlights: • TiOx thin films were deposited by radio frequency magnetron sputtering in Ar and Ar/H{sub 2}O plasma. • The deposited films contain OH groups in their bulk structure irrespective of the water content of the working gas. • The structure and photocatalytic activity of the deposited films were studied. - Abstract: The present work is investigating the photocatalytic activity of TiO{sub 2} thin films deposited by radiofrequency magnetron sputtering of a pure TiO{sub 2} target in Ar and Ar/H{sub 2}O (pressure ratio 40/3) plasmas. Optical absorption, structure, surface morphology and chemical structure of the deposited films were comparatively studied. The films were amorphous and included a large amount of hydroxyl groups (about 5% of oxygen atoms were bounded to hydrogen) irrespective of the intentional content of water in the deposition chamber. Incorporation of hydroxyl groups in the film deposited in pure Ar plasma is explained as contamination of the working gas with water molecules desorbed by plasma from the deposition chamber walls. However, intentional input of water vapour into the discharge chamber decreased the deposition speed and roughness of the deposited films. The good photocatalytic activity of the deposited films could be attributed hydroxyl groups in their structures.

  16. Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique

    Science.gov (United States)

    Liang, SONG; Xianping, WANG; Le, WANG; Ying, ZHANG; Wang, LIU; Weibing, JIANG; Tao, ZHANG; Qianfeng, FANG; Changsong, LIU

    2017-04-01

    He-charged oxide dispersion strengthened (ODS) FeCrNi films were prepared by a radio-frequency (RF) plasma magnetron sputtering method in a He and Ar mixed atmosphere at 150 °C. As a comparison, He-charged FeCrNi films were also fabricated at the same conditions through direct current (DC) plasma magnetron sputtering. The doping of He atoms and Y2O3 in the FeCrNi films was realized by the high backscattered rate of He ions and Y2O3/FeCrNi composite target sputtering method, respectively. Inductive coupled plasma (ICP) and x-ray photoelectron spectroscopy (XPS) analysis confirmed the existence of Y2O3 in FeCrNi films, and Y2O3 content hardly changed with sputtering He/Ar ratio. Cross-sectional scanning electron microscopy (SEM) shows that the FeCrNi films were composed of dense columnar nanocrystallines and the thickness of the films was obviously dependent on He/Ar ratio. Nanoindentation measurements revealed that the FeCrNi films fabricated through DC/RF plasma magnetron sputtering methods exhibited similar hardness values at each He/Ar ratio, while the dispersion of Y2O3 apparently increased the hardness of the films. Elastic recoil detection (ERD) showed that DC/RF magnetron sputtered FeCrNi films contained similar He amounts (∼17 at.%). Compared with the minimal change of He level with depth in DC-sputtered films, the He amount decreases gradually in depth in the RF-sputtered films. The Y2O3-doped FeCrNi films were shown to exhibit much smaller amounts of He owing to the lower backscattering possibility of Y2O3 and the inhibition effect of nano-sized Y2O3 particles on the He element.

  17. Strongly coupled quark-gluon plasma in heavy ion collisions

    Science.gov (United States)

    Shuryak, Edward

    2017-07-01

    A decade ago, a brief summary of the field of the relativistic heavy ion physics could be formulated as the discovery of strongly coupled quark-gluon plasma, sQGP for short, a near-perfect fluid with surprisingly large entropy-density-to-viscosity ratio. Since 2010, the LHC heavy ion program added excellent new data and discoveries. Significant theoretical efforts have been made to understand these phenomena. Now there is a need to consolidate what we have learned and formulate a list of issues to be studied next. Studies of angular correlations of two and more secondaries reveal higher harmonics of flow, identified as the sound waves induced by the initial state perturbations. As in cosmology, detailed measurements and calculations of these correlations helped to make our knowledge of the explosion much more quantitative. In particular, their damping had quantified the viscosity. Other kinetic coefficients—the heavy-quark diffusion constants and the jet quenching parameters—also show enhancements near the critical point T ≈Tc. Since densities of QGP quarks and gluons strongly decrease at this point, these facts indicate large role of nonperturbative mechanisms, e.g., scattering on monopoles. New studies of the p p and p A collisions at high multiplicities reveal collective explosions similar to those in heavy ion A A collisions. These "smallest drops of the sQGP" revived debates about the initial out-of-equilibrium stage of the collisions and mechanisms of subsequent equilibration.

  18. Synthesis, transport, and retention of tin nanodroplets in a magnetron sputtering source combined with a capacitively-coupled plasma

    Science.gov (United States)

    Sasaki, K.; Takanari, K.

    2016-09-01

    The intention of this work was the development of a method for coating metal nanodroplets with thin films having high melting temperatures. To realize this process technology, we combined a magnetron sputtering plasma for synthesizing metal nanoparticles with a capacitively-coupled plasma (CCP) for retaining and heating synthesized nanoparticles. The magnetron sputtering source with a tin target was operated at a high pressure of 400 mTorr. The high pressure induced the condensation of tin atoms in the gas phase, resulting in the formation of tin nanoparticles. The nanoparticles were transported downward, and were trapped in the sheath electric field near the planar electrode for the CCP discharge. The formation, the transport, and the retention of nanoparticles were monitored by laser light scattering. Collected tin nanoparticles did not have agglomerated shapes, suggesting that tin nanoparticles were melted when they were stored in the CCP discharge. The surfaces of tin nanoparticles were oxidized. When we introduced methane before the collection, we observed core-shell nanoparticles without oxidization. Tin nanoparticles were coated with amorphous carbon films by plasma-enhanced chemical vapor deposition of methane.

  19. Sputtering by the Solar Wind: Effects of Variable Composition

    Science.gov (United States)

    Killen, R. M.; Arrell, W. M.; Sarantos, M.; Delory, G. T.

    2011-01-01

    It has long been recognized that solar wind bombardment onto exposed surfaces in the solar system will produce an energetic component to the exospheres about those bodies. Laboratory experiments have shown that there is no increase in the sputtering yield caused by highly charged heavy ions for metallic and for semiconducting surfaces, but the sputter yield can be noticeably increased in the case of a good insulating surface. Recently measurements of the solar wind composition have become available. It is now known that the solar wind composition is highly dependent on the origin of the particular plasma. Using the measured composition of the slow wind, fast wind, solar energetic particle (SEP) population, and coronal mass ejection (CME), broken down into its various components, we have estimated the total sputter yield for each type of solar wind. Whereas many previous calculations of sputtering were limited to the effects of proton bombardment. we show that the heavy ion component. especially the He++ component. can greatly enhance the total sputter yield during times when the heavy ion population is enhanced. We will discuss sputtering of both neutrals and ions.

  20. Turbulent transport and heating of trace heavy ions in hot, magnetized plasmas

    CERN Document Server

    Barnes, M; Dorland, W

    2012-01-01

    Scaling laws for the transport and heating of trace heavy ions in low-frequency, magnetized plasma turbulence are derived and compared with direct numerical simulations. The predicted dependences of turbulent fluxes and heating on ion charge and mass number are found to agree with numerical results for both stationary and differentially rotating plasmas. Heavy ion momentum transport is found to increase with mass, and heavy ions are found to be preferentially heated, implying a mass-dependent ion temperature for very weakly collisional plasmas and for partially-ionized heavy ions in strongly rotating plasmas.

  1. Preparation of Ag-containing diamond-like carbon films on the interior surface of tubes by a combined method of plasma source ion implantation and DC sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Hatada, R., E-mail: hatada@ca.tu-darmstadt.de [Technische Universität Darmstadt, Department of Materials Science, 64287 Darmstadt (Germany); Flege, S.; Bobrich, A.; Ensinger, W.; Dietz, C. [Technische Universität Darmstadt, Department of Materials Science, 64287 Darmstadt (Germany); Baba, K. [Industrial Technology Center of Nagasaki, Applied Technology Division, Omura, Nagasaki 856-0026 (Japan); Sawase, T.; Watamoto, T. [Nagasaki University, Department of Applied Prosthodontics, Nagasaki 852-8523 (Japan); Matsutani, T. [Technische Universität Darmstadt, Department of Materials Science, 64287 Darmstadt (Germany); Kinki University, Department of Electric and Electronic Engineering, Higashi-osaka 577-2332 (Japan)

    2014-08-15

    Highlights: • Deposition of Ag-containing diamond-like carbon films inside of tubes. • Combination of plasma source ion implantation and DC sputtering. • Antibacterial effect against S. aureus bacteria. - Abstract: Adhesive diamond-like carbon (DLC) films can be prepared by plasma source ion implantation (PSII), which is also suitable for the treatment of the inner surface of a tube. Incorporation of a metal into the DLC film provides a possibility to change the characteristics of the DLC film. One source for the metal is DC sputtering. In this study PSII and DC sputtering were combined to prepare DLC films containing low concentrations of Ag on the interior surfaces of stainless steel tubes. A DLC film was deposited using a C{sub 2}H{sub 4} plasma with the help of an auxiliary electrode inside of the tube. This electrode was then used as a target for the DC sputtering. A mixture of the gases Ar and C{sub 2}H{sub 4} was used to sputter the silver. By changing the gas flow ratios and process time, the resulting Ag content of the films could be varied. Sample characterizations were performed by X-ray photoelectron spectroscopy, secondary ion mass spectrometry, atomic force microscopy and Raman spectroscopy. Additionally, a ball-on-disk test was performed to investigate the tribological properties of the films. The antibacterial activity was determined using Staphylococcus aureus bacteria.

  2. Quark-gluon plasma: Status of heavy ion physics

    Indian Academy of Sciences (India)

    R V Gavai

    2000-07-01

    Lattice quantum chromodynamics (QCD), defined on a discrete space–time lattice, leads to a spectacular non-perturbative prediction of a new state of matter, called quark-gluon plasma (QGP), at sufficiently high temperatures or equivalently large energy densities. The experimental programs of CERN, Geneva and BNL, New York of relativistic heavy ion collisions are expected to produce such energy densities, thereby providing us a chance to test the above prediction. After a brief introduction of the necessary theoretical concepts, I will present a critical review of the experimental results already obtained by the various experiments in order to examine whether QGP has already been observed by them.

  3. Plasma sputtering robotic device for in-situ thick coatings of long, small diameter vacuum tubesa)

    Science.gov (United States)

    Hershcovitch, A.; Blaskiewicz, M.; Brennan, J. M.; Custer, A.; Dingus, A.; Erickson, M.; Fischer, W.; Jamshidi, N.; Laping, R.; Liaw, C.-J.; Meng, W.; Poole, H. J.; Todd, R.

    2015-05-01

    A novel robotic plasma magnetron mole with a 50 cm long cathode was designed, fabricated, and operated. The reason for this endeavor is to alleviate the problems of unacceptable resistive heating of stainless steel vacuum tubes in the BNL Relativistic Heavy Ion Collider (RHIC). The magnetron mole was successfully operated to copper coat an assembly containing a full-size, stainless steel, cold bore, RHIC magnet tubing connected to two types of RHIC bellows, to which two additional pipes made of RHIC tubing were connected. To increase the cathode lifetime, a movable magnet package was developed, and the thickest possible cathode was made, with a rather challenging target to substrate (de facto anode) distance of less than 1.5 cm. Achieving reliable steady state magnetron discharges at such a short cathode to anode gap was rather challenging, when compared to commercial coating equipment, where the target to substrate distance is 10's cm; 6.3 cm is the lowest experimental target to substrate distance found in the literature. Additionally, the magnetron developed during this project provides unique omni-directional uniform coating. The magnetron is mounted on a carriage with spring loaded wheels that successfully crossed bellows and adjusted for variations in vacuum tube diameter, while keeping the magnetron centered. Electrical power and cooling water were fed through a cable bundle. The umbilical cabling system is driven by a motorized spool. Excellent coating adhesion was achieved. Measurements indicated that well-scrubbed copper coating reduced secondary electron yield to 1, i.e., the problem of electron clouds can be eliminated. Room temperature RF resistivity measurement indicated that a 10 μm copper coated stainless steel RHIC tube has a conductivity close to that of pure copper tubing. Excellent coating adhesion was achieved. The device details and experimental results are described.

  4. Plasma Sputtering Robotic Device for In-Situ Thick Coatings of Long, Small Diameter Vacuum Tubes

    Science.gov (United States)

    Hershcovitch, Ady

    2014-10-01

    A novel robotic plasma magnetron mole with a 50 cm long cathode was designed fabricated & operated. Reason for this endeavor is to alleviate the problems of unacceptable ohmic heating of stainless steel vacuum tubes and of electron clouds, due to high secondary electron yield (SEY), in the BNL Relativistic Heavy Ion Collider (RHIC). The magnetron mole was successfully operated to copper coat an assembly containing a full-size, stainless steel, cold bore, RHIC magnet tubing connected to two types of RHIC bellows, to which two additional pipes made of RHIC tubing were connected. To increase cathode lifetime, movable magnet package was developed, and thickest possible cathode was made, with a rather challenging target to substrate (de facto anode) distance of less than 1.5 cm. Achieving reliable steady state magnetron discharges at such a short cathode to anode gap was rather challenging, when compared to commercial coating equipment, where the target to substrate distance is 10's cm; 6.3 cm is the lowest experimental target to substrate distance found in the literature. Additionally, the magnetron developed during this project provides unique omni-directional uniform coating. The magnetron is mounted on a carriage with spring loaded wheels that successfully crossed bellows and adjusted for variations in vacuum tube diameter, while keeping the magnetron centered. Electrical power and cooling water were fed through a cable bundle. The umbilical cabling system is driven by a motorized spool. Excellent coating adhesion was achieved. Measurements indicated that well-scrubbed copper coating reduced SEY to 1, i.e., the problem of electron clouds can be eliminated. Room temperature RF resistivity measurement indicated that 10 μm Cu coated stainless steel RHIC tube has conductivity close to that of pure copper tubing. Excellent coating adhesion was achieved. Device detail and experimental results will be presented. Work supported by Brookhaven Science Associates, LLC under

  5. Plasma sputtering robotic device for in-situ thick coatings of long, small diameter vacuum tubes

    Energy Technology Data Exchange (ETDEWEB)

    Hershcovitch, A., E-mail: hershcovitch@bnl.gov; Blaskiewicz, M.; Brennan, J. M.; Fischer, W.; Liaw, C.-J.; Meng, W.; Todd, R. [Brookhaven National Laboratory, Upton, New York 11973 (United States); Custer, A.; Dingus, A.; Erickson, M.; Jamshidi, N.; Laping, R.; Poole, H. J. [PVI, Oxnard, California 93031 (United States)

    2015-05-15

    A novel robotic plasma magnetron mole with a 50 cm long cathode was designed, fabricated, and operated. The reason for this endeavor is to alleviate the problems of unacceptable resistive heating of stainless steel vacuum tubes in the BNL Relativistic Heavy Ion Collider (RHIC). The magnetron mole was successfully operated to copper coat an assembly containing a full-size, stainless steel, cold bore, RHIC magnet tubing connected to two types of RHIC bellows, to which two additional pipes made of RHIC tubing were connected. To increase the cathode lifetime, a movable magnet package was developed, and the thickest possible cathode was made, with a rather challenging target to substrate (de facto anode) distance of less than 1.5 cm. Achieving reliable steady state magnetron discharges at such a short cathode to anode gap was rather challenging, when compared to commercial coating equipment, where the target to substrate distance is 10's cm; 6.3 cm is the lowest experimental target to substrate distance found in the literature. Additionally, the magnetron developed during this project provides unique omni-directional uniform coating. The magnetron is mounted on a carriage with spring loaded wheels that successfully crossed bellows and adjusted for variations in vacuum tube diameter, while keeping the magnetron centered. Electrical power and cooling water were fed through a cable bundle. The umbilical cabling system is driven by a motorized spool. Excellent coating adhesion was achieved. Measurements indicated that well-scrubbed copper coating reduced secondary electron yield to 1, i.e., the problem of electron clouds can be eliminated. Room temperature RF resistivity measurement indicated that a 10 μm copper coated stainless steel RHIC tube has a conductivity close to that of pure copper tubing. Excellent coating adhesion was achieved. The device details and experimental results are described.

  6. Working group report: Heavy-ion physics and quark-gluon plasma

    Indian Academy of Sciences (India)

    Munshi G Mustafa; Sudhir Raniwala; T Awes; B Rai; R S Bhalerao; J G Contreras; R V Gavai; S K Ghosh; P Jaikumar; G C Mishra; A P Mishra; H Mishra; B Mohanty; J Nayak; J-Y Ollitrault; S C Phatak; L Ramello; R Ray; P K Sahu; A M Srivastava; D K Srivastava; V K Tiwari

    2006-11-01

    This is the report of Heavy Ion Physics and Quark-Gluon Plasma at WHEPP-09 which was part of Working Group-4. Discussion and work on some aspects of quark-gluon plasma believed to have created in heavy-ion collisions and in early Universe are reported.

  7. THE MARINE HEAVY FUEL IGNITION AND COMBUSTION BY PLASMA

    Directory of Open Access Journals (Sweden)

    MOROIANU CORNELIU

    2015-05-01

    Full Text Available The continuous damage of the used fuel quality, of its dispersion due to the increasing viscosity, make necessary the volume expansion and the rise of the e electric spark power used at ignition. A similar situation appears to the transition of the generator operation from the marine Diesel heavy fuel to the residues of water-fuel mixture. So, it feels like using an ignition system with high specific energy and power able to perform the starting and burning of the fuels mentioned above. Such a system is that which uses a low temperature plasma jet. Its use involves obtaining a high temperature area round about the jet, with a high discharge power, extending the possibility of obtaining a constant burning of different concentration (density mixtures. Besides the action of the temperature of the air-fuel mixture, the plasma jet raises the rate of oxidation reaction as a result of appearance of lot number of active centers such as loaded molecules, atoms, ions, free radicals.

  8. Self-catalyzed carbon plasma-assisted growth of tin-doped indium oxide nanostructures by the sputtering method

    Science.gov (United States)

    Setti, Grazielle O.; de Jesus, Dosil P.; Joanni, Ednan

    2016-10-01

    In this work a new strategy for growth of nanostructured indium tin oxide (ITO) by RF sputtering is presented. ITO is deposited in the presence of a carbon plasma which reacts with the free oxygen atoms during the deposition, forming species like CO x . These species are removed from the chamber by the pumping system, and one-dimensional ITO nanostructures are formed without the need for a seed layer. Different values of substrate temperature and power applied to the gun containing the carbon target were investigated, resulting in different nanostructure morphologies. The samples containing a higher density of nanowires were covered with gold and evaluated as surface-enhanced Raman scattering substrates for detection of dye solutions. The concept might be applied to other oxides, providing a simple method for unidimensional nanostructural synthesis.

  9. Tunneling Magnetoresistance (TMR on Fe-Al2O3 Nano Granular Film Growth by Helicon Plasma Sputtering

    Directory of Open Access Journals (Sweden)

    S. Purwanto

    2008-01-01

    Full Text Available Fe-Al2O3 nanogranular thin film by helicon plasma sputtering with the variation of Fe content from 0.1 to 0.7 volume fraction have been prepared. The magnetic and magnetoresistance properties were investigated by a Vibrating Sample Magnetometer (VSM and a Four Point Probe (FPP. The Rutherford BackScattering (RBS was performed with the SIMNRA software. Conversion Electron Mossbauer Spectroscopy (CEMS study was also performed to estimate the fraction of Fe and α-Fe2O3 in the granular film. The results suggested that the percolation concentration occured at 0.55 Fe volume fractions, with the maximum Magnetoresistance (MR ratio of 3%. The present MR ratio that was lower than the previous results may be related to the existence of α-Fe2O3 phase.

  10. Study of the wear resistance of ion-plasma coatings based on titanium and aluminum and obtained by magnetron sputtering

    Science.gov (United States)

    Kachalin, G. V.; Mednikov, A. F.; Tkhabisimov, A. B.; Sidorov, S. V.

    2017-05-01

    The paper presents the results of metallographic researches and erosion tests of ion-plasma coatings (based on titanium, aluminum and their nitrides), which were formed on samples of 12Kh13 and EI961 blade steels. Erosion tests and studies of characteristics of obtained by magnetron sputtering coatings were carried out by using a set of research equipment UNU “Erosion-M” NRU “MPEI”. It was found that the formed Ti/Al-TiN/AlN coatings increase the duration of blade steels erosion wear incubation period by at least in 1.5 times and have a layered structure with thicknesses of nitride layers 1.3-1.6 μm and intermediate metallic layers 0.3-0.5 μm, with a total thickness of coatings of 10-14 μm for 12Kh13steel samples and 19-21 μm for EI961 steel samples.

  11. The Structure and Properties of Inductively Coupled Plasma Assisted Magnetron Sputtered Nanocrystalline NbN Coatings in Corrosion Protective Die Casting Molds.

    Science.gov (United States)

    Chun, Sung-Yong

    2016-02-01

    Niobium nitride coatings for the surface modified die casting molds with various ICP powers have been prepared using ICP assisted magnetron sputtering. The applied ICP power was varied from 0 to 200 W. The deposited coatings were characterized post-deposition using X-ray diffractometry (XRD) and atomic force microscopy (AFM). Single NbN phased coatings with nano-grain sized (hardness of each coating were evaluated from potentiostat and nanoindentator. Superior corrosion protective coatings in excess of 13.9 GPa were deposited with assistance of ICP plasma during sputtering.

  12. Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties

    Directory of Open Access Journals (Sweden)

    Stefan Flege

    2017-01-01

    Full Text Available Metal-containing diamond-like carbon (Me-DLC films were prepared by a combination of plasma source ion implantation (PSII and reactive magnetron sputtering. Two metals were used that differ in their tendency to form carbide and possess a different sputter yield, that is, Cu with a relatively high sputter yield and Ti with a comparatively low one. The DLC film preparation was based on the hydrocarbon gas ethylene (C2H4. The preparation technique is described and the parameters influencing the metal content within the film are discussed. Film properties that are changed by the metal addition, such as structure, electrical resistivity, and friction coefficient, were evaluated and compared with those of pure DLC films as well as with literature values for Me-DLC films prepared with a different hydrocarbon gas or containing other metals.

  13. Plasma diagnostics of an Ar/NH{sub 3} direct-current reactive magnetron sputtering discharge for SiN{sub x} deposition

    Energy Technology Data Exchange (ETDEWEB)

    Henry, F., E-mail: Fhenry@ulb.ac.be; Duluard, C.Y.; Batan, A.; Reniers, F., E-mail: Freniers@ulb.ac.be

    2012-08-01

    We have performed the deposition of silicon nitride thin films with the DC reactive magnetron sputtering technique from a silicon target in an Ar/NH{sub 3} gas mixture. Usually, the control of the process is carried out with discharge voltage measurements, which give information on the nature of the sputtering mode: metallic or reactive. To have a more complete view of the sputtering process, we have performed X-ray photoelectron spectroscopy (XPS) to investigate the chemistry of the silicon target racetrack and optical emission spectroscopy (OES) to investigate the Ar/NH{sub 3} gas phase near the target surface. When the NH{sub 3} molar fraction is increased, XPS measurements reveal the progressive formation of a silicon nitride layer on the target surface, thereby demonstrating a continuous transition to the reactive mode. OES measurements have highlighted the presence of several species which, according to the literature, are believed to be directly sputtered from the surface of the target: Si, SiH and SiN. Their intensities could be related to the chemical state of the target surface and provide a better insight into the sputtering process on the target surface. - Highlights: Black-Right-Pointing-Pointer Plasma diagnostics of Ar/NH{sub 3} DC reactive magnetron sputtering. Black-Right-Pointing-Pointer Multiple diagnostic techniques. Black-Right-Pointing-Pointer Poisoning of the target by formation of silicon nitride layer. Black-Right-Pointing-Pointer Relation between the light emitted by the plasma and the surface state of the target.

  14. Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates

    Energy Technology Data Exchange (ETDEWEB)

    Brennan, Christopher J.; Neumann, Christopher M.; Vitale, Steven A., E-mail: steven.vitale@ll.mit.edu [Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02420 (United States)

    2015-07-28

    Fully depleted silicon-on-insulator transistors were fabricated using two different metal gate deposition mechanisms to compare plasma damage effects on gate oxide quality. Devices fabricated with both plasma-enhanced atomic-layer-deposited (PE-ALD) TiN gates and magnetron plasma sputtered TiN gates showed very good electrostatics and short-channel characteristics. However, the gate oxide quality was markedly better for PE-ALD TiN. A significant reduction in interface state density was inferred from capacitance-voltage measurements as well as a 1200× reduction in gate leakage current. A high-power magnetron plasma source produces a much higher energetic ion and vacuum ultra-violet (VUV) photon flux to the wafer compared to a low-power inductively coupled PE-ALD source. The ion and VUV photons produce defect states in the bulk of the gate oxide as well as at the oxide-silicon interface, causing higher leakage and potential reliability degradation.

  15. Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates

    Science.gov (United States)

    Brennan, Christopher J.; Neumann, Christopher M.; Vitale, Steven A.

    2015-07-01

    Fully depleted silicon-on-insulator transistors were fabricated using two different metal gate deposition mechanisms to compare plasma damage effects on gate oxide quality. Devices fabricated with both plasma-enhanced atomic-layer-deposited (PE-ALD) TiN gates and magnetron plasma sputtered TiN gates showed very good electrostatics and short-channel characteristics. However, the gate oxide quality was markedly better for PE-ALD TiN. A significant reduction in interface state density was inferred from capacitance-voltage measurements as well as a 1200× reduction in gate leakage current. A high-power magnetron plasma source produces a much higher energetic ion and vacuum ultra-violet (VUV) photon flux to the wafer compared to a low-power inductively coupled PE-ALD source. The ion and VUV photons produce defect states in the bulk of the gate oxide as well as at the oxide-silicon interface, causing higher leakage and potential reliability degradation.

  16. Preparation of Ag-containing diamond-like carbon films on the interior surface of tubes by a combined method of plasma source ion implantation and DC sputtering

    Science.gov (United States)

    Hatada, R.; Flege, S.; Bobrich, A.; Ensinger, W.; Dietz, C.; Baba, K.; Sawase, T.; Watamoto, T.; Matsutani, T.

    2014-08-01

    Adhesive diamond-like carbon (DLC) films can be prepared by plasma source ion implantation (PSII), which is also suitable for the treatment of the inner surface of a tube. Incorporation of a metal into the DLC film provides a possibility to change the characteristics of the DLC film. One source for the metal is DC sputtering. In this study PSII and DC sputtering were combined to prepare DLC films containing low concentrations of Ag on the interior surfaces of stainless steel tubes. A DLC film was deposited using a C2H4 plasma with the help of an auxiliary electrode inside of the tube. This electrode was then used as a target for the DC sputtering. A mixture of the gases Ar and C2H4 was used to sputter the silver. By changing the gas flow ratios and process time, the resulting Ag content of the films could be varied. Sample characterizations were performed by X-ray photoelectron spectroscopy, secondary ion mass spectrometry, atomic force microscopy and Raman spectroscopy. Additionally, a ball-on-disk test was performed to investigate the tribological properties of the films. The antibacterial activity was determined using Staphylococcus aureus bacteria.

  17. Energy change of a heavy quark in a viscous quark–gluon plasma with fluctuations

    Energy Technology Data Exchange (ETDEWEB)

    Jiang, Bing-feng, E-mail: jiangbf@mails.ccnu.edu.cn [Center for Theoretical Physics and School of Sciences, Hubei University for Nationalities, Enshi, Hubei 445000 (China); Hou, De-fu, E-mail: houdf@mail.ccnu.edu.cn [Key Laboratory of Quark and Lepton Physics (MOE) and Institute of Particle Physics, Central China Normal University, Wuhan, Hubei 430079 (China); Li, Jia-rong, E-mail: ljr@mail.ccnu.edu.cn [Key Laboratory of Quark and Lepton Physics (MOE) and Institute of Particle Physics, Central China Normal University, Wuhan, Hubei 430079 (China)

    2016-09-15

    When a heavy quark travels through the quark–gluon plasma, the polarization and fluctuating chromoelectric fields will be produced simultaneously in the plasma. The drag force due to those fields exerting in return on the moving heavy quark will cause energy change to it. Based on the dielectric functions derived from the viscous chromohydrodynamics, we have studied the collisional energy change of a heavy quark traversing the viscous quark–gluon plasma including fluctuations of chromoelectric field. Numerical results indicate that the chromoelectric field fluctuations lead to an energy gain of the moving heavy quark. Shear viscosity suppresses the fluctuation-induced energy gain and the viscous suppression effect for the charm quark is much more remarkable than that for the bottom quark. While, the fluctuation energy gain is much smaller than the polarization energy loss in magnitude and the net energy change for the heavy quark is at loss.

  18. Note: Easy-to-maintain electron cyclotron resonance (ECR) plasma sputtering apparatus featuring hybrid waveguide and coaxial cables for microwave delivery.

    Science.gov (United States)

    Akazawa, Housei

    2016-06-01

    The branched-waveguide electron cyclotron resonance plasma sputtering apparatus places quartz windows for transmitting microwaves into the plasma source not in the line of sight of the target. However, the quartz windows must be replaced after some time of operation. For maintenance, the loop waveguide branching from the T-junction must be dismounted and re-assembled accurately, which is a time-consuming job. We investigated substituting the waveguide branches with two sets of coaxial cables and waveguide/coaxial cable converters to simplify assembly as far as connection and disconnection go. The resulting hybrid system worked well for the purposes of plasma generation and film deposition.

  19. A global plasma model for reactive deposition of compound films by modulated pulsed power magnetron sputtering discharges

    Science.gov (United States)

    Zheng, B. C.; Wu, Z. L.; Wu, B.; Li, Y. G.; Lei, M. K.

    2017-05-01

    A spatially averaged, time-dependent global plasma model has been developed to describe the reactive deposition of a TiAlSiN thin film by modulated pulsed power magnetron sputtering (MPPMS) discharges in Ar/N2 mixture gas, based on the particle balance and the energy balance in the ionization region, and considering the formation and erosion of the compound at the target surface. The modeling results show that, with increasing the N2 partial pressure from 0% to 40% at a constant working pressure of 0.3 Pa, the electron temperature during the strongly ionized period increases from 4 to 7 eV and the effective power transfer coefficient, which represents the power fraction that effectively heats the electrons and maintains the discharge, increases from about 4% to 7%; with increasing the working pressure from 0.1 to 0.7 Pa at a constant N2 partial pressure of 25%, the electron temperature decreases from 10 to 4 eV and the effective power transfer coefficient decreases from 8% to 5%. Using the modeled plasma parameters to evaluate the kinetic energy of arriving ions, the ion-to-neutral flux ratio of deposited species, and the substrate heating, the variations of process parameters that increase these values lead to an enhanced adatom mobility at the target surface and an increased input energy to the substrate, corresponding to the experimental observation of surface roughness reduction, the microstructure transition from the columnar structure to the dense featureless structure, and the enhancement of phase separation. At higher N2 partial pressure or lower working pressure, the modeling results demonstrate an increase in electron temperature, which shifts the discharge balance of Ti species from Ti+ to Ti2+ and results in a higher return fraction of Ti species, corresponding to the higher Al/Ti ratio of deposited films at these conditions. The modeling results are well correlated with the experimental observation of the composition variation and the microstructure

  20. Electrostatic energy analyzer measurements of low energy zirconium beam parameters in a plasma sputter-type negative ion source.

    Science.gov (United States)

    Malapit, Giovanni M; Mahinay, Christian Lorenz S; Poral, Matthew D; Ramos, Henry J

    2012-02-01

    A plasma sputter-type negative ion source is utilized to produce and detect negative Zr ions with energies between 150 and 450 eV via a retarding potential-type electrostatic energy analyzer. Traditional and modified semi-cylindrical Faraday cups (FC) inside the analyzer are employed to sample negative Zr ions and measure corresponding ion currents. The traditional FC registered indistinct ion current readings which are attributed to backscattering of ions and secondary electron emissions. The modified Faraday cup with biased repeller guard ring, cut out these signal distortions leaving only ringings as issues which are theoretically compensated by fitting a sigmoidal function into the data. The mean energy and energy spread are calculated using the ion current versus retarding potential data while the beam width values are determined from the data of the transverse measurement of ion current. The most energetic negative Zr ions yield tighter energy spread at 4.11 eV compared to the least energetic negative Zr ions at 4.79 eV. The smallest calculated beam width is 1.04 cm for the negative Zr ions with the highest mean energy indicating a more focused beam in contrast to the less energetic negative Zr ions due to space charge forces.

  1. Effects of ion irradiation on structural and magnetic properties of Fe/Si multilayers prepared by helicon plasma sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Purwanto, Setyo E-mail: setyofzm@batan.go.id; Sakamoto, I. E-mail: isao-sakamoto@aist.go.jp; Koike, M.; Tanoue, H.; Honda, S

    2003-05-01

    Helicon plasma sputtering has been used to prepare Fe/Si MLs with an Fe layer thickness around t{sub Fe}=2-5 nm for a Si spacer fixed at the thickness of t{sub Si}=1 and 1.5 nm. Present study found that the Fe/Si MLs of the Si spacer thickness at t{sub Si}=1 nm exhibit antiferromagnetic nature, but the other Fe/Si MLs are ferromagnetic. The maximum value of magnetoresistance (MR) ratio in Fe/Si MLs appears at t{sub Fe}=3 nm, t{sub Si}=1 nm and is about 0.22%. We performed 400 keV Ar ion irradiation to investigate the behavior of magnetic properties in Fe/Si MLs. The magnetization measurements of Fe/Si MLs after 400 keV Ar ion irradiation show the degradation of antiferromagnetic behavior and the values of MR ratio after ion irradiation decrease. X-ray diffraction (XRD) patterns indicate that the peak intensity of a satellite peak originated in superlattice structure does not change within the range of ion dose used. These results imply that the interface structures after ion irradiation become rough although the superlattice structures remain. Therefore, we consider that the change of MR properties in Fe/Si MLs by 400 keV Ar ion irradiation is due to the thickness dependence of Si layers like metallic superlattice structures.

  2. Effects of ion irradiation on structural and magnetic properties of Fe/Si multilayers prepared by helicon plasma sputtering

    Science.gov (United States)

    Purwanto, Setyo; Sakamoto, I.; Koike, M.; Tanoue, H.; Honda, S.

    2003-05-01

    Helicon plasma sputtering has been used to prepare Fe/Si MLs with an Fe layer thickness around tFe=2-5 nm for a Si spacer fixed at the thickness of tSi=1 and 1.5 nm. Present study found that the Fe/Si MLs of the Si spacer thickness at tSi=1 nm exhibit antiferromagnetic nature, but the other Fe/Si MLs are ferromagnetic. The maximum value of magnetoresistance (MR) ratio in Fe/Si MLs appears at tFe=3 nm, tSi=1 nm and is about 0.22%. We performed 400 keV Ar ion irradiation to investigate the behavior of magnetic properties in Fe/Si MLs. The magnetization measurements of Fe/Si MLs after 400 keV Ar ion irradiation show the degradation of antiferromagnetic behavior and the values of MR ratio after ion irradiation decrease. X-ray diffraction (XRD) patterns indicate that the peak intensity of a satellite peak originated in superlattice structure does not change within the range of ion dose used. These results imply that the interface structures after ion irradiation become rough although the superlattice structures remain. Therefore, we consider that the change of MR properties in Fe/Si MLs by 400 keV Ar ion irradiation is due to the thickness dependence of Si layers like metallic superlattice structures.

  3. Vitrification of MSWI Fly Ash by Thermal Plasma Melting and Fate of Heavy Metals

    Institute of Scientific and Technical Information of China (English)

    倪国华; 赵鹏; 江贻满; 孟月东

    2012-01-01

    Municipal solid waste incinerator (MSWI) fly ash with high basicity (about 1.68) was vitrified in a thermal plasma melting furnace system. Through the thermal plasma treatment, the vitrified product (slag) with amorphous dark glassy structure was obtained, and the leachability of hazardous metals in slag was significantly reduced. Meanwhile, it was found that the cooling rate affects significantly the immobility of heavy metals in slag. The mass distribution of heavy metals (Zn, Cd, Cr, Pb, As, Hg) was investigated in residual products (slag, secondary residues and flue gas), in order to analyze the behavior of heavy metals in thermal plasma atmosphere. Heavy metal species with low boiling points accounting for the major fraction of their input-mass were adsorbed in secondary residues by pollution abatement devices, while those with high boiling points tended to be encapsulated in slag.

  4. Kinetic and Potential Sputtering Enhancements of Lunar Regolith Erosion: The Contribution of the Heavy Multicharged (Minority) Solar Wind Constituents

    Science.gov (United States)

    Meyer, F. W.; Barghouty, A. F.

    2012-01-01

    We report preliminary results for H+, Ar+1, Ar+6 and Ar+9 ion sputtering of JSC-1A lunar regolith simulant at solar wind velocities, obtain ed at the ORNL Multicharged Ion Research Facility using quadrupole ma ss spectrometry. The multi-charged Ar ions were used as proxies for i ntermediate mass solar wind multicharged ions. Prior to the Ar beam e xposures, the sample was exposed to high fluence H+ irradiation to si mulate H-loading due to the dominant solar wind constituent. A x80 en hancement of oxygen sputtering by Ar+ over same velocity H+ was measu red and an additional x2 increase for Ar+9 over same velocity Ar+ was demonstrated, giving clear evidence of the importance of potential s puttering by multicharged ions. This enhancement was observed to pers ist to the maximum fluences investigated (approx 10(exp 16)/sq cm). As discussed in a companion abstract by N. Barghouty, such persistent s puttering enhancement has significant implications on weathering and aging of lunar regolith. In addition, XPS measurements showed strong evidence of Fe reduction for those target areas that had been exposed to high fluence Ar+ and Ar+8 beams. Preferential oxidation of the Fe -reduced beam-exposed regions during transfer to the XPS system led t o enhanced O concentrations in those regions as well. On the basis of these very promising preliminary results, a NASA-LASER project on mo re extensive measurements was recently selected for funding. The prop osal expands the collaboration with NASA-MSFC for the simulation effort, and adds a new collaboration with NASA-GSFC for lunar mission-rele vant measurements.

  5. Vehicle exhaust gas clearance by low temperature plasma-driven nano-titanium dioxide film prepared by radiofrequency magnetron sputtering.

    Directory of Open Access Journals (Sweden)

    Shuang Yu

    Full Text Available A novel plasma-driven catalysis (PDC reactor with special structure was proposed to remove vehicle exhaust gas. The PDC reactor which consisted of three quartz tubes and two copper electrodes was a coaxial dielectric barrier discharge (DBD reactor. The inner and outer electrodes firmly surrounded the outer surface of the corresponding dielectric barrier layer in a spiral way, respectively. Nano-titanium dioxide (TiO2 film prepared by radiofrequency (RF magnetron sputtering was coated on the outer wall of the middle quartz tube, separating the catalyst from the high voltage electrode. The spiral electrodes were designed to avoid overheating of microdischarges inside the PDC reactor. Continuous operation tests indicated that stable performance without deterioration of catalytic activity could last for more than 25 h. To verify the effectiveness of the PDC reactor, a non-thermal plasma(NTP reactor was employed, which has the same structure as the PDC reactor but without the catalyst. The real vehicle exhaust gas was introduced into the PDC reactor and NTP reactor, respectively. After the treatment, compared with the result from NTP, the concentration of HC in the vehicle exhaust gas treated by PDC reactor reduced far more obviously while that of NO decreased only a little. Moreover, this result was explained through optical emission spectrum. The O emission lines can be observed between 870 nm and 960 nm for wavelength in PDC reactor. Together with previous studies, it could be hypothesized that O derived from catalytically O3 destruction by catalyst might make a significant contribution to the much higher HC removal efficiency by PDC reactor. A series of complex chemical reactions caused by the multi-components mixture in real vehicle exhaust reduced NO removal efficiency. A controllable system with a real-time feedback module for the PDC reactor was proposed to further improve the ability of removing real vehicle exhaust gas.

  6. Vehicle exhaust gas clearance by low temperature plasma-driven nano-titanium dioxide film prepared by radiofrequency magnetron sputtering.

    Science.gov (United States)

    Yu, Shuang; Liang, Yongdong; Sun, Shujun; Zhang, Kai; Zhang, Jue; Fang, Jing

    2013-01-01

    A novel plasma-driven catalysis (PDC) reactor with special structure was proposed to remove vehicle exhaust gas. The PDC reactor which consisted of three quartz tubes and two copper electrodes was a coaxial dielectric barrier discharge (DBD) reactor. The inner and outer electrodes firmly surrounded the outer surface of the corresponding dielectric barrier layer in a spiral way, respectively. Nano-titanium dioxide (TiO2) film prepared by radiofrequency (RF) magnetron sputtering was coated on the outer wall of the middle quartz tube, separating the catalyst from the high voltage electrode. The spiral electrodes were designed to avoid overheating of microdischarges inside the PDC reactor. Continuous operation tests indicated that stable performance without deterioration of catalytic activity could last for more than 25 h. To verify the effectiveness of the PDC reactor, a non-thermal plasma(NTP) reactor was employed, which has the same structure as the PDC reactor but without the catalyst. The real vehicle exhaust gas was introduced into the PDC reactor and NTP reactor, respectively. After the treatment, compared with the result from NTP, the concentration of HC in the vehicle exhaust gas treated by PDC reactor reduced far more obviously while that of NO decreased only a little. Moreover, this result was explained through optical emission spectrum. The O emission lines can be observed between 870 nm and 960 nm for wavelength in PDC reactor. Together with previous studies, it could be hypothesized that O derived from catalytically O3 destruction by catalyst might make a significant contribution to the much higher HC removal efficiency by PDC reactor. A series of complex chemical reactions caused by the multi-components mixture in real vehicle exhaust reduced NO removal efficiency. A controllable system with a real-time feedback module for the PDC reactor was proposed to further improve the ability of removing real vehicle exhaust gas.

  7. A New Type of Multielements-Doped, Carbon-based Materials Characterized by High-thermoconductiv ity, Low Chemical Sputtering, Low RES Yield and Exposure to Plasma

    Institute of Scientific and Technical Information of China (English)

    许增裕; 刘翔; 谌继明; 王明旭; 宋进仁; 翟更太; 李承新

    2002-01-01

    Low-Z materials, such as carbon-based materials and Be, are major plasma-facing material (PFM) for current, even in future fusion devices. In this paper, a new type of multielement-doped carbon-based materials developed are presented along with experimental re sults of their properties. The results indicate a decrease in chemical sputtering yield by one order of magnitude, a decrease in both thermal shock resistance and radiation-enhanced sublimation, an evidently lower temperature desorption spectrum, and combined properties of exposing to plasma.

  8. Characterization and modelling of microwave multi dipole plasmas. Application to multi dipolar plasma assisted sputtering; Caracterization et modelisation des plasmas micro-onde multi-dipolaires. Application a la pulverisation assistee par plasma multi-dipolaire

    Energy Technology Data Exchange (ETDEWEB)

    Tran, Tan Vinh [Universite Joseph Fourier/CNRS-IN2P3, 53 Avenue des Martyrs, F-38026 Grenoble (France)

    2006-07-01

    the magnet has also shown a better radial confinement with magnets exhibiting high length over diameter ratios. In addition, the numerical study corroborates the results of the experimental study, i.e. an ECR coupling region close to the equatorial plane of the magnet and not near the end of the coaxial microwave line. Finally, these results have been successfully applied to plasma assisted sputtering of targets allowing, in particular, their uniform erosion. (author)

  9. Structure of Pt/C and PtRu/C catalytic layers prepared by plasma sputtering and electric performance in direct methanol fuel cells (DMFC)

    Energy Technology Data Exchange (ETDEWEB)

    Caillard, A.; Brault, P.; Mathias, J. [Groupe de Recherche sur l' Energetique des Milieux Ionises, UMR6606 Universite d' Orleans, CNRS, Polytech' Orleans BP6744, F-45067 Orleans Cedex 2 (France); Coutanceau, C.; Leger, J.-M. [Laboratoire de Catalyse en Chimie Organique, UMR6503 Universite de Poitiers, CNRS, F-86022 Poitiers (France)

    2006-11-08

    Plasma sputtering process was used to deposit Pt and PtRu on conductive carbon diffusion layer. Low metal loading catalysts for methanol electrooxidation were prepared and characterized by TEM and XRD. The main result is that codeposition of Pt and Ru leads to alloy phase, whereas multi-layers deposition leads to no-alloyed structure. The electrochemical performance of sputtered Pt/C electrodes was compared with that of standard electrodes, and was found lower. However, the specific activity was much higher, indicating that the catalyst utilization efficiency was higher than that obtained with a standard electrode. Then, different bimetallic PtRu/C electrodes were prepared by plasma sputtering, leading to different catalyst structures (Pt and Ru multilayer deposition or simultaneous deposition of Pt and Ru) and composition (from 100:0 to 50:50 Pt/Ru atomic ratios). At last, the different PtRu electrodes were compared in term of DMFC electrical performance. The best efficiency of the DMFC was reached when both metals Pt and Ru are simultaneously deposited (alloyed) with a ruthenium atomic ratio of 30% or 40 % Ru depending of the working potentials of the cell. (author)

  10. Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. power

    Energy Technology Data Exchange (ETDEWEB)

    Rashid, Nur Maisarah Abdul, E-mail: nurmaisarahrashid@gmail.com [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Ritikos, Richard; Othman, Maisara; Khanis, Noor Hamizah; Gani, Siti Meriam Ab. [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Muhamad, Muhamad Rasat [Chancellery Office, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Rahman, Saadah Abdul, E-mail: saadah@um.edu.my [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Chancellery Office, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)

    2013-02-01

    Silicon carbon films were deposited using a hybrid radio frequency (r.f.) plasma enhanced chemical vapor deposition (PECVD)/sputtering deposition system at different r.f. powers. This deposition system combines the advantages of r.f. PECVD and sputtering techniques for the deposition of silicon carbon films with the added advantage of eliminating the use of highly toxic silane gas in the deposition process. Silicon (Si) atoms were sputtered from a pure amorphous silicon (a-Si) target by argon (Ar) ions and carbon (C) atoms were incorporated into the film from C based growth radicals generated through the discharge of methane (CH{sub 4}) gas. The effects of r.f. powers of 60, 80, 100, 120 and 150 W applied during the deposition process on the structural and optical properties of the films were investigated. Raman spectroscopic studies showed that the silicon carbon films contain amorphous silicon carbide (SiC) and amorphous carbon (a-C) phases. The r.f. power showed significant influence on the C incorporation in the film structure. The a-C phases became more ordered in films with high C incorporation in the film structure. These films also produced high photoluminescence emission intensity at around 600 nm wavelength as a result of quantum confinement effects from the presence of sp{sup 2} C clusters embedded in the a-SiC and a-C phases in the films. - Highlights: ► Effects of radio frequency (r.f.) power on silicon carbon (SiC) films were studied. ► Hybrid plasma enhanced chemical vapor deposition/sputtering technique was used. ► r.f. power influences C incorporation in the film structure. ► High C incorporation results in higher ordering of the amorphous C phase. ► These films produced high photoluminescence emission intensity.

  11. Degrees of Freedom of the Quark Gluon Plasma, tested by Heavy Mesons

    CERN Document Server

    Berrehrah, H; Song, T; Ozvenchuck, V; Gossiaux, P B; Werner, K; Bratkovskaya, E; Aichelin, J

    2016-01-01

    Heavy quarks (charm and bottoms) are one of the few probes which are sensitive to the degrees of freedom of a Quark Gluon Plasma (QGP), which cannot be revealed by lattice gauge calculations in equilibrium. Due to the rapid expansion of the QGP energetic heavy quarks do not come to an equilibrium with the QGP. Their energy loss during the propagation through the QGP medium depends strongly on the modelling of the interaction of the heavy quarks with the QGP quarks and gluons, i.e. on the assuption of the degrees of freedom of the plasma. Here we compare the results of different models, the pQCD based Monte-Carlo (MC@sHQ), the Dynamical Quasi Particle Model (DQPM) and the effective mass approach, for the drag force in a thermalized QGP and discuss the sensitivity of heavy quark energy loss on the properties of the QGP as well as on non-equilibrium dynamics

  12. Heavy-ion-acoustic solitary and shock waves in an adiabatic multi-ion plasma

    Energy Technology Data Exchange (ETDEWEB)

    Hossen, M.A.; Rahman, M.M.; Mamun, A.A., E-mail: armanplasma@gmail.com [Department of Physics, Jahangirnagar University, Savar, Dhaka (Bangladesh); Hossen, M.R. [Department of Natural Sciences, Daffodil International University, Dhanmondi, Dhaka (Bangladesh)

    2015-08-15

    The standard reductive perturbation method has been employed to derive the Korteweg-deVries (K-dV) and Burgers (BG) equations to investigate the basic properties of heavy-ion-acoustic (HIA) waves in a plasma system which is supposed to be composed of nonthermal electrons, Boltzmann distributed light ions, and adiabatic positively charged inertial heavy ions. The HIA solitary and shock structures are found to exist with either positive or negative potential. It is found that the effects of adiabaticity of inertial heavy ions, nonthermality of electrons, and number densities of plasma components significantly modify the basic properties of the HIA solitary and shock waves. The implications of our results may be helpful in understanding the electrostatic perturbations in various laboratory and astrophysical plasma environments. (author)

  13. Preliminary evaluation of a process using plasma reactions to desulfurize heavy oils. Final report

    Energy Technology Data Exchange (ETDEWEB)

    Grimes, P.W.; Miknis, F.P.

    1997-09-01

    Western Research Institute (WRI) has conducted exploratory experiments on the use of microwave-induced plasmas to desulfurize heavy oils. Batch mode experiments were conducted in a quartz reactor system using various reactive and nonreactive plasmas. In these experiments a high-sulfur asphalt was exposed to various plasmas, and the degree of conversion to distillate, gas, and solids was recorded. Products from selected experiments were analyzed to determine if the plasma exposure had resulted in a significant reduction in sulfur content. Exploratory experiments were conducted using reactive plasmas generated from hydrogen and methane and nonreactive plasmas generated from nitrogen. The effects of varying exposure duration, sample temperature, and location of the sample with respect to the plasma discharge were investigated. For comparative purposes two experiments were conducted in which the sample was heated under nitrogen with no plasma exposure. Distillates containing approximately 28% less sulfur than the feedstock represented the maximum desulfurization attained in the plasma experiments. It does not appear that plasma reactions using the simple configurations employed in this study represent a viable method for the desulfurization of heavy oils.

  14. Heavy-Quark Diffusion Dynamics in Quark-Gluon Plasma under Strong Magnetic Fields

    CERN Document Server

    Hattori, Koichi; Yee, Ho-Ung; Yin, Yi

    2016-01-01

    We discuss heavy-quark dynamics in the quark-gluon plasma under a strong magnetic field induced by colliding nuclei. By the use of the diagrammatic resummation techniques for Hard Thermal Loop and the external magnetic field, we show analytic results of heavy-quark diffusion coefficient and drag force which become anisotropic due to the preferred spatial orientation in the magnetic field. We argue that the anisotropic diffusion coefficient gives rise to an enhancement/suppression of the heavy-quark elliptic flow depending on the transverse momentum.

  15. Study of sterilization-treatment in pure and N- doped carbon thin films synthesized by inductively coupled plasma assisted pulsed-DC magnetron sputtering

    Science.gov (United States)

    Javid, Amjed; Kumar, Manish; Han, Jeon Geon

    2017-01-01

    Electrically-conductive nanocrystalline carbon films, having non-toxic and non-immunogenic characteristics, are promising candidates for reusable medical devices. Here, the pure and N- doped nanocrystalline carbon films are deposited by the assistance of inductively coupled plasma (ICP) in an unbalanced facing target pulsed-DC magnetron sputtering process. Through the optical emission spectroscopy study, the role of ICP assistance and N-doping on the reactive components/radicals during the synthesis is presented. The N-doping enhances the three fold bonding configurations by increasing the ionization and energies of the plasma species. Whereas, the ICP addition increases the plasma density to control the deposition rate and film structure. As a result, sputtering-throughput (deposition rate: 31-55 nm/min), electrical resistivity (4-72 Ωcm) and water contact angle (45.12°-54°) are significantly tailored. Electric transport study across the surface microchannel confirms the superiority of N-doped carbon films for sterilization stability over the undoped carbon films.

  16. Workshop on Quark-Gluon Plasma and Relativistic Heavy Ions

    CERN Document Server

    Lombardo, Maria Paola; Nardi, Marzia; GISELDA 2002; QGP 2002

    2002-01-01

    This book offers the unique possibility of tackling the problem of hadronic deconfinement from different perspectives. After general introductions to the physical issues, from both the theoretical and the experimental point of view, the book presents the most recent expertise on field theory approaches to the QCD phase diagram, many-body techniques and applications, the dynamics of phase transitions, and phenomenological analysis of relativistic heavy ion collisions. One of the major goals of this book is to promote interchange among those fields of research, which have traditionally been cult

  17. Probing the Quark Gluon Plasma with Heavy Flavours: recent results from ALICE

    CERN Document Server

    CERN. Geneva

    2017-01-01

    The study of open heavy-flavour physics allows us to investigate the key properties of the Quark-Gluon Plasma (QGP) and the microscopic processes ongoing in the medium produced in heavy-ion collisions at relativistic energies. Heavy quarks are produced in the early stages of heavy-ion collisions and their further production and annihilation rates in the medium are expected to be very small throughout the evolution of the system. Therefore, they serve as penetrating probes that traverse the hot and dense medium, interact with the partonic constituents of the plasma and lose energy. Understanding the interactions of heavy quarks with the medium requires precise measurements over a wide momentum range in heavy-ion collisions, but also in smaller systems like pp collisions, which also test next-to-leading order perturbative QCD calculations, and proton-nucleus collisions, which are sensitive to Cold Nuclear Matter effects (CNM), such as the modification of the parton distribution functions of nuclei, and parton ...

  18. An outlook of heavy ion driven plasma research at IMP-Lanzhou

    Science.gov (United States)

    Zhao, Yongtao; Xiao, Guoqing; Xu, Hushan; Zhao, Hongwei; Xia, Jiawen; Jin, Genming; Ma, Xinwen; Liu, Yong; Yang, Zhihu; Zhang, Pengming; Wang, Yuyu; Li, Deihui; Zhao, Huanyu; Zhan, Wenlong; Xu, Zhongfeng; Zhao, Di; Li, Fuli; Chen, Ximeng

    2009-01-01

    Since the successful completion of the cooling storage ring (CSR) project in China at the end of 2007, high qualitative heavy ion beams with energy ranging from keV to GeV/u have been available at the Heavy Ion Research Facility at Lanzhou (HIRFL). More than 10 9 1 GeV/u C 6+ particles or 10 8 235 MeV/u Xe particles can be stored in the CSR main-ring and extracted within hundred nano-seconds during the test running, the beam parameters will be improved in the coming years so that high energy density (HED) conditions could be achieved and investigated there. Recent scientific results from the experiments relevant to plasma research on HIRFL are summarized. Dense plasma research with intense heavy ion beams of CSR is proposed here.

  19. Contribution to the study of sputtering and damage of uranium dioxide by fast heavy ions; Contribution a l'etude de la pulverisation et de l'endommagement du dioxyde d'uranium par les ions lourds rapides

    Energy Technology Data Exchange (ETDEWEB)

    Schlutig, S

    2001-03-01

    Swift heavy ion-solid interaction leads in volume to track creation and on the surface to the ejection of particles into the vacuum. To learn more about initial mechanisms of track formation, we are focused on the sputtering of uranium dioxide by fast heavy ions. This present study is exclusively devoted to the influence of the electronic stopping power on the emission of neutral particles and especially on their angular distribution. These measurements are completed by those of the ions emitted from UO{sub 2} targets bombarded with swift heavy ions. The whole experimental results give access to: i) the nature of the sputtered particles; ii) the charge state of the emitted particles; iii) the direction of ejection of the sputtered particles ; iv) the sputtering yields deduced from the angular distributions. These results are compared to the prediction of the sputtering models proposed in the literature and it seems that the supersonic gas flow model is well suited to describe our results. Finally, the sputtering yields are compared with a set of earlier experimental data on uranium dioxide damage obtained by T. Wiss and we observe that only a small fraction of UO{sub 2} monolayers are sputtered. (author)

  20. Linear and nonlinear heavy ion-acoustic waves in a strongly coupled plasma

    Energy Technology Data Exchange (ETDEWEB)

    Ema, S. A., E-mail: ema.plasma@gmail.com; Mamun, A. A. [Department of Physics, Jahangirnagar University, Savar, Dhaka-1342 (Bangladesh); Hossen, M. R. [Deparment of Natural Sciences, Daffodil International University, Sukrabad, Dhaka-1207 (Bangladesh)

    2015-09-15

    A theoretical study on the propagation of linear and nonlinear heavy ion-acoustic (HIA) waves in an unmagnetized, collisionless, strongly coupled plasma system has been carried out. The plasma system is assumed to contain adiabatic positively charged inertial heavy ion fluids, nonextensive distributed electrons, and Maxwellian light ions. The normal mode analysis is used to study the linear behaviour. On the other hand, the well-known reductive perturbation technique is used to derive the nonlinear dynamical equations, namely, Burgers equation and Korteweg-de Vries (K-dV) equation. They are also numerically analyzed in order to investigate the basic features of shock and solitary waves. The adiabatic effects on the HIA shock and solitary waves propagating in such a strongly coupled plasma are taken into account. It has been observed that the roles of the adiabatic positively charged heavy ions, nonextensivity of electrons, and other plasma parameters arised in this investigation have significantly modified the basic features (viz., polarity, amplitude, width, etc.) of the HIA solitary/shock waves. The findings of our results obtained from this theoretical investigation may be useful in understanding the linear as well as nonlinear phenomena associated with the HIA waves both in space and laboratory plasmas.

  1. Study of the Matrix Effect on the Plasma Characterization of Heavy Elements in Soil Sediments

    Directory of Open Access Journals (Sweden)

    Tawfik W.

    2007-01-01

    Full Text Available Laser-induced breakdown spectroscopy (LIBS has been applied to perform a study of the matrix effect on the plasma characterization of soil sediment targets. The plasma is generated by focusing a pulsed Nd: YAG laser on the target in air at atmospheric pressure. The plasma emission spectrum was detected using a portable Echelle spectrometer (Mechelle 7500 — Multichannel Instruments, Stockholm, Sweden with intensified CCD camera. Spectroscopic analysis of plasma evolution of laser produced plasmas has been characterized in terms of their spectra, and electron temperature. Four heavy elements V, Pb, Mn and Co were determined in the obtained spectra. The LTE and optically thin plasma conditions were verified for the produced plasma. The electron temperature and density were determined using the emission intensity and stark broadening, respectively, of the spectral lines of the heavy elements in the soil sediments. The electron temperature does not change with concentration. For environmental applications, the obtained results showed the capability of the proposed LIBS setup with the portable Mechelle 7500 spectrometer to be applied in-situ for real-time measurements of the variation of the matrix elemental composition of soil sediments by following up only a single element as a marker for the composition of the soil sediment without need of analysis of the other elements.

  2. Nonlinear ion-acoustic waves in a degenerate plasma with nuclei of heavy elements

    Energy Technology Data Exchange (ETDEWEB)

    Hossen, M. A., E-mail: armanplasma@gmail.com; Mamun, A. A., E-mail: mamun-phys@yahoo.co.uk [Department of Physics, Jahangirnagar University, Savar, Dhaka-1342 (Bangladesh)

    2015-10-15

    The ion-acoustic (IA) solitary waves propagating in a fully relativistic degenerate dense plasma (containing relativistic degenerate electron and ion fluids, and immobile nuclei of heavy elements) have been theoretically investigated. The relativistic hydrodynamic model is used to derive the Korteweg-de Vries (K-dV) equation by the reductive perturbation method. The stationary solitary wave solution of this K-dV equation is obtained to characterize the basic features of the IA solitary structures that are found to exist in such a degenerate plasma. It is found that the effects of electron dynamics, relativistic degeneracy of the plasma fluids, stationary nuclei of heavy elements, etc., significantly modify the basic properties of the IA solitary structures. The implications of this results in astrophysical compact objects like white dwarfs are briefly discussed.

  3. Thin films of thermoelectric compound Mg{sub 2}Sn deposited by co-sputtering assisted by multi-dipolar microwave plasma

    Energy Technology Data Exchange (ETDEWEB)

    Le-Quoc, H., E-mail: huy.le-quoc@lpsc.in2p3.fr [Laboratoire de Physique Subatomique et de Cosmologie - CNRS/UJF/Grenoble INP, 53 rue des Martyrs, 38026 Grenoble, Cedex (France); Institut Neel, CNRS, BP 166, F-38042, Grenoble, Cedex 9 (France); Lacoste, A., E-mail: ana.lacoste@ujf-grenoble.fr [Laboratoire de Physique Subatomique et de Cosmologie - CNRS/UJF/Grenoble INP, 53 rue des Martyrs, 38026 Grenoble, Cedex (France); Hlil, E.K. [Institut Neel, CNRS, BP 166, F-38042, Grenoble, Cedex 9 (France); Bes, A.; Vinh, T. Tan [Laboratoire de Physique Subatomique et de Cosmologie - CNRS/UJF/Grenoble INP, 53 rue des Martyrs, 38026 Grenoble, Cedex (France); Fruchart, D. [Institut Neel, CNRS, BP 166, F-38042, Grenoble, Cedex 9 (France); Skryabina, N. [Department of Physics, Perm State University, 614990 Perm (Russian Federation)

    2011-10-13

    Highlights: > Mg{sub 2}Sn thin films deposited by plasma co-sputtering, on silicon and glass substrates. > Formation of nano-grained polycrystalline films on substrates at room temperature. > Structural properties vary with target biasing and target-substrate distance. > Formation of the hexagonal phase of Mg{sub 2}Sn in certain deposition conditions. > Power factor {approx}5.0 x 10{sup -3} W K{sup -2} m{sup -1} for stoichiometric Mg{sub 2}Sn films doped with {approx}1 at.% Ag. - Abstract: Magnesium stannide (Mg{sub 2}Sn) thin films doped with Ag intended for thermoelectric applications are deposited on both silicon and glass substrates at room temperature by plasma assisted co-sputtering. Characterization by scanning electron microscopy, energy-dispersive X-ray spectroscopy and X-ray diffraction confirms the formation of fine-grained polycrystalline thin films with thickness of 1-3 {mu}m. Stoichiometry, microstructure and crystal structure of thin films are found to vary with target biasing and the distance from targets to substrate. Measurements of electrical resistivity and Seebeck coefficient at room temperature show the maximum power factor of {approx}5.0 x 10{sup -3} W K{sup -2} m{sup -1} for stoichiometric Mg{sub 2}Sn thin films doped with {approx}1 at.% Ag.

  4. Effect of heavy metals on plasma membrane lipids and antioxidant enzymes of Zygophyllum species

    Directory of Open Access Journals (Sweden)

    Amal Ahmed Morsy

    2012-01-01

    Full Text Available Background: Heavy metals are major environmental pollutant when they present in high concentration in soil and have toxic effects on growth and development of plants. Industrial activities result in heavy metal pollution of large areas of land, which greatly affects natural vegetation. Understanding the mechanism of how plants combat heavy metals adverse effects is hence of great importance. Materials and Methods: Two different localities were chosen; one locality was in the vicinity of gypsum factory and the other one was 25 km away from the factory. Two Zygophyllum species (Z. album and Z. coccineum were naturally grown in the studied areas. The effects of soil heavy metal stress on shoot heavy metal concentrations, lipid peroxidation, antioxidant enzyme activities and the root plasma membrane (PM lipid composition were analyzed. Results: Heavy metal concentrations and Lipid peroxidation increased in the shoot of both species grown in the polluted area. The activities of ascorbate oxidase (ASO, guaiacal peroxidase (GPX, ascorbate peroxidase (APX and superoxide dismutase (SOD were increased whereas these of catalase (CAT were decreased in both species under the polluted conditions. PM total lipids, phospholipids, glycolipids and sterols were decreased in Z. album and Z. coccineum as a result of the polluted soil. Heavy metal stress increased phosphatidylethanolamine (PE and decreased phosphatidylinositol (PI and phophatidylglycerol (PG, with no significant change in phosphatidylcholine (PC in the root PM of both species. Phosphatidylserine (PS decreased in the PM of Z. album whereas it increased in the PM of Z. coccineum under the pollution conditions. Heavy metal stress changed the composition and concentration of fatty acids of the root PM, resulting in increased sat/unsat ratio of both species. Conclusion: the results suggest that efficient antioxidant machinery and favorable PM lipid homeostasis are important to enable Zygophyllum species

  5. Plasma treatment of INEL soil contaminated with heavy metals

    Energy Technology Data Exchange (ETDEWEB)

    Detering, B.A.; Batdorf, J.A.

    1992-01-01

    INEL soil spiked with inorganic salts of chromium, lead, mercury, silver, and zinc was melted in a 150 kW plasma furnace to produce a glassy slag product. This glassy slag is an environmentally safe waste form. In order to reduce the melting temperature of the soil, sodium carbonate was added to half of the test batches. Random sample from each batch of glassy slag product were analyzed by an independent laboratory for total metals concentration and leachability of metals via the Environmental Protection Agency (EPA) toxicity characterization leaching procedure (RCLP) tests. These tests showed the residual metals were very tightly bound to the slag matrix and were within EPA TCLP limits under these test conditions. Additionally, scanning electron microscopy (SEM) and emissions dispersive spectroscopy (EDS) analysis of the vitrified soil also confirmed that the added metals present in the vitrified soil were totally contained in the crystalline phase as distinct oxide crystallites.

  6. Collisional Energy Loss of a Heavy Quark in an Anisotropic Quark-Gluon Plasma

    CERN Document Server

    Romatschke, P; Romatschke, Paul; Strickland, Michael

    2004-01-01

    We compute the leading-order collisional energy loss of a heavy quark propagating through a quark-gluon plasma in which the quark and gluon distributions are anisotropic in momentum space. Following the calculation outlined for QED in an earlier work we indicate the differences encountered in QCD and their effect on the collisional energy loss results. For a 20 GeV bottom quark we show that momentum space anisotropies can result in the collisional heavy quark energy loss varying with the angle of propagation by up to 50%. For low velocity quarks we show that anisotropies result in energy gain instead of energy loss with the energy gain focused in such a way as to accelerate particles along the anisotropy direction thereby reducing the momentum-space anisotropy. The origin of this negative energy loss is explicitly identified as being related to the presence of plasma instabilities in the system.

  7. Plasma volume and electrolyte shifts with heavy exercise in sitting and supine positions

    Science.gov (United States)

    Greenleaf, J. E.; Van Beaumont, W.; Brock, P. J.; Morse, J. T.; Mangseth, G. R.

    1979-01-01

    An experimental study was carried out to compare fluid and electrolyte shifts after heavy exercise performed by four voluntary male subjects (26-45 yr) in sitting and supine positions. Plasma volume and electrolyte shifts were measured during the 6-min control period and for 60 min after a continuous peak oxygen uptake test. The results indicate that the most likely driving force for the restitution of plasma volume after peak exercise is provided by a change in hydrostatic and/or systemic blood pressures when exercise ceases.

  8. Effects of Different Heavy-Resistance Exercise Protocols on Plasma Beta-Endorphin Concentrations

    Science.gov (United States)

    1993-01-01

    exercise increases in muscular hypertrophy (27). Thus each exer- protocols used previously. Each subject gave informed cise series provides for...ANTE. P. D., AND M. E. HOUSTON. Effects of concentric and DUDLEY. C. M. MARESH, L. MARCHIrELLI, C. CRUTHIRDS, T. eccentric exercise on protein catabolism...DTIC Effects of different heavy-resistance exercise ELECTE protocols on plasma #-endorphin concentrations MAR 3 0 1993 C WILLIAM J. KRAEMER, JOSEPH E

  9. High-k gadolinium scandate on Si obtained by high pressure sputtering from metal targets and in-situ plasma oxidation

    Science.gov (United States)

    Pampillón, M. A.; San Andrés, E.; Feijoo, P. C.; Fierro, J. L. G.

    2017-03-01

    This article studies the physical and electrical behavior of Gd2‑x Sc x O3 layers grown by high pressure sputtering from metallic Gd and Sc targets. The aim is to obtain a high permittivity dielectric for microelectronic applications. The films were obtained by the deposition of a metallic nanolaminate of Gd and Sc alternating layers, which is afterwards in-situ oxidized by plasma. The oxide films obtained were close to stoichiometry, amorphous and with minimal interfacial regrowth. By fabricating metal–insulator–semiconductor capacitors we found that a moderate temperature annealing is needed to enhance permittivity, which reaches a high value of 32 while keeping moderate leakage. Finally, the feasibility of interface scavenging in this material with Ti gate electrodes is also demonstrated.

  10. Absolute densities of Cu, Zn, Sn, and S atoms in magnetron sputtering plasmas employing a Cu2ZnSnS4 target

    Science.gov (United States)

    Nafarizal, Nayan; Sasaki, Koichi

    2016-07-01

    Absolute densities of Cu, Zn, Sn, and S atoms in magnetron sputtering plasmas were measured by ultraviolet absorption spectroscopy and vacuum ultraviolet absorption spectroscopy. A stoichiometric Cu2ZnSnS4 (CZTS) target was used in this work. It was found that, at various Ar pressures, the S density ranged between (2-8) × 1010 cm-3, the Cu and Sn densities ranged between (0.6-3) × 1010 cm-3, and the Zn density ranged between (2-3) × 109 cm-3. The effective depositing flux, which was evaluated from the absolute densities and the sticking probabilities, was comparable with that evaluated from the deposition rate of the CZTS film. However, the composition ratio of Cu, Zn, Sn, and S in the gas phase deviated from the ideal stoichiometry of CZTS. We discussed the possible mechanisms for the difference among the element compositions of the target, the deposited film, and the gas-phase densities.

  11. Stress-induced VO{sub 2} films with M2 monoclinic phase stable at room temperature grown by inductively coupled plasma-assisted reactive sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Okimura, Kunio; Watanabe, Tomo [School of Engineering, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292 (Japan); Sakai, Joe [GREMAN, UMR 7347 CNRS, Universite Francois Rabelais de Tours, Parc de Grandmont 37200 Tours (France)

    2012-04-01

    We report on growth of VO{sub 2} films with M2 monoclinic phase stable at room temperature under atmospheric pressure. The films were grown on quartz glass and Si substrates by using an inductively coupled plasma-assisted reactive sputtering method. XRD-sin{sup 2}{Psi} measurements revealed that the films with M2 phase are under compressive stress in contrast to tensile stress of films with M1 phase. Scanning electron microscopy observations revealed characteristic crystal grain aspects with formation of periodical twin structure of M2 phase. Structural phase transition from M2 to tetragonal phases, accompanied by a resistance change, was confirmed to occur as the temperature rises. Growth of VO{sub 2} films composed of M2 phase crystalline is of strong interest for clarifying nature of Mott transition of strongly correlated materials.

  12. Structure and deuterium retention properties of tungsten layers deposited by plasma sputtering in a mixed atmosphere of D2 and He

    Science.gov (United States)

    Tang, X. H.; Shi, L. Q.; O'Connor, D. J.; King, B.

    2014-03-01

    The influence of the deposition conditions on the surface morphology, crystal structure and deuterium retention of the tungsten layers formed by rf magnetron plasma sputtering in mixed atmosphere of D2, He and Ar, has been carried out. Helium containing deuterated tungsten layers (named He-WDx) on Cu/Si substrate demonstrate serious film damages with zones of cracks, fractures, flaking-off and large surface blisters. However, these kinds of damages do not happen on the He-WDx layers performed on mechanically polished polycrystalline Cu substrates because of larger surface roughness of the substrates. The crystal structure of the W layer greatly changes with the additional He in the layer, and large amounts of defects resulting in lattice expansion and X-diffraction peak broadening were produced in the W crystal. He in the W layer has direct impacts on D retention. Both D and He concentrations vary simultaneously with He fraction, attached negative bias and substrate temperature.

  13. Structural properties of Al{sub 2}O{sub 3}/AlN thin film prepared by magnetron sputtering of Al in HF-activated nitrogen plasma

    Energy Technology Data Exchange (ETDEWEB)

    Dallaeva, D.S. [Dagestan State Technical University, av. I. Shamilya 70a, Machachkala, 367015 Dagestan Republic (Russian Federation); Dagestan State University, M. Gadgieva street, Machachkala, 367001 Dagestan Republic (Russian Federation); Brno University of Technology, Faculty of Electrical Engineering and Communication, Physics Department, Technicka 8, 616 00 Brno (Czech Republic); Bilalov, B.A.; Gitikchiev, M.A.; Kardashova, G.D.; Safaraliev, G.K. [Dagestan State Technical University, av. I. Shamilya 70a, Machachkala, 367015 Dagestan Republic (Russian Federation); Dagestan State University, M. Gadgieva street, Machachkala, 367001 Dagestan Republic (Russian Federation); Tomanek, P., E-mail: tomanek@feec.vutbr.cz [Brno University of Technology, Faculty of Electrical Engineering and Communication, Physics Department, Technicka 8, 616 00 Brno (Czech Republic); Skarvada, P. [Brno University of Technology, Faculty of Electrical Engineering and Communication, Physics Department, Technicka 8, 616 00 Brno (Czech Republic); Smith, S. [South Dakota School of Mines and Technology, Physics Department, 501 E. St. Joseph St, Rapid City, SD 57701 (United States)

    2012-12-30

    A process for ion-plasma formation of aluminum nitride (AlN) nanolayers on nitrided sapphire (Al{sub 2}O{sub 3}) substrates is presented. The method is based on the direct current magnetron sputtering of a high-purity aluminum target in the presence of an argon-nitrogen gas mix and high frequency-activated nitrogen plasma. The method, combined with ion etching, produced matched layers by nitration of Al{sub 2}O{sub 3} in the (0001) plane, and formation of high quality AlN epilayers on this surface was observed. The processing characteristics and morphology dependence on synthesis parameters were studied using atomic force microscopy. - Highlights: Black-Right-Pointing-Pointer Technology based on plasma processes was used. Black-Right-Pointing-Pointer Shemical composition of elements in the layers was analyzed. Black-Right-Pointing-Pointer Near-surface layer was obtained on the sapphire substrate by nitridation. Black-Right-Pointing-Pointer Increasing of substrate temperature stimulates the growth of layer perfection. Black-Right-Pointing-Pointer Morphology is connected with growth mechanism and the structure of substrate.

  14. Synthesis of ZnO nanorods-Au nanoparticles hybrids via in-situ plasma sputtering-assisted method for simultaneous electrochemical sensing of ascorbic acid and uric acid

    Energy Technology Data Exchange (ETDEWEB)

    Hou, Chao [College of Life Information Science & Instrument Engineering, Hangzhou Dianzi University, Hangzhou 310018 (China); Liu, Hongying, E-mail: liuhongying@hdu.edu.cn [College of Life Information Science & Instrument Engineering, Hangzhou Dianzi University, Hangzhou 310018 (China); State Key Laboratory of Analytical Chemistry for Life Science, School of Chemistry & Chemical Engineering, Nanjing University, Nanjing 210093 (China); Zhang, Dan; Yang, Chi [Department of Pharmacy, Nantong University, Nantong 226001 (China); Zhang, Mingzhen [College of Life Information Science & Instrument Engineering, Hangzhou Dianzi University, Hangzhou 310018 (China)

    2016-05-05

    In this study, ZnO nanorods-Au nanoparticles (ZnO NRs-Au NPs) hybrids were prepared using an in-situ plasma sputtering-assisted method without any template. Characterization results from scanning electron microscopy, high-resolution transmission electron microscopy, and energy dispersive X-ray spectroscopy showed that Au NPs are highly dispersed and tightly anchored on the surface of ZnO NRs. The size and surface coverage of Au NPs were well controlled by plasma sputtering time. Moreover, the hybrids exhibited excellent electrocatalytic properties towards oxidation of ascorbic acid (AA) and uric acid (UA) due to large surface area of Au NPs and ZnO NRs, and thus can be used as electrochemical sensors. Differential pulse voltammetry results showed that AA and UA could be detected simultaneously by ZnO NRs-Au NPs hybrids modified glassy carbon electrode. The linear ranges for AA and UA are 0.1 to 4 mM and 0.01 to 0.4 mM, respectively. The results suggest promising future applications in clinical diagnosis. - Highlights: • ZnO nanorods-Au nanoparticles were synthesized by in-situ plasma sputtering method. • Influence of sputtering time on the formation of Au nanoparticles was studied. • It exhibited a strong electrocatalytic activity toward the oxidation of ascorbic acid and uric acid. • A portable and cheap approach for simultaneous detection of ascorbic acid and uric acid was developed.

  15. The effect of realistic heavy particle induced secondary electron emission coefficients on the electron power absorption dynamics in single- and dual-frequency capacitively coupled plasmas

    Science.gov (United States)

    Daksha, M.; Derzsi, A.; Wilczek, S.; Trieschmann, J.; Mussenbrock, T.; Awakowicz, P.; Donkó, Z.; Schulze, J.

    2017-08-01

    In particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations of capacitively coupled plasmas (CCPs), the plasma-surface interaction is generally described by a simple model in which a constant secondary electron emission coefficient (SEEC) is assumed for ions bombarding the electrodes. In most PIC/MCC studies of CCPs, this coefficient is set to γ = 0.1, independent of the energy of the incident particle, the electrode material, and the surface conditions. Here, the effects of implementing energy-dependent secondary electron yields for ions, fast neutrals, and taking surface conditions into account in PIC/MCC simulations is investigated. Simulations are performed using self-consistently calculated effective SEECs, {γ }* , for ‘clean’ (e.g., heavily sputtered) and ‘dirty’ (e.g., oxidized) metal surfaces in single- and dual-frequency discharges in argon and the results are compared to those obtained by assuming a constant secondary electron yield of γ =0.1 for ions. In single-frequency (13.56 MHz) discharges operated under conditions of low heavy particle energies at the electrodes, the pressure and voltage at which the transition between the α- and γ-mode electron power absorption occurs are found to strongly depend on the surface conditions. For ‘dirty’ surfaces, the discharge operates in α-mode for all conditions investigated due to a low effective SEEC. In classical dual-frequency (1.937 MHz + 27.12 MHz) discharges {γ }* significantly increases with increasing low-frequency voltage amplitude, {V}{LF}, for dirty surfaces. This is due to the effect of {V}{LF} on the heavy particle energies at the electrodes, which negatively influences the quality of the separate control of ion properties at the electrodes. The new results on the separate control of ion properties in such discharges indicate significant differences compared to previous results obtained with different constant values of γ.

  16. Effects of Charge in Heavy Ions on Solitary Kinetic Alfvén Waves in Double-Ion Plasmas

    Institute of Scientific and Technical Information of China (English)

    YANG Lei; WU De-Jin

    2006-01-01

    @@ After the charge of heavy ions is considered, a Sagdeev equation is obtained for the solitary kinetic Alfvén waves (SKAWs) in a low-β(me/mp<<β<<1 or mp/me>>α>>1), three-component (electrons, protons, and highly charged heavy ions) plasma. Numerical results show that the charge number q of heavy ions can cause the width of the solitary structure to decrease, but increase for the maximum of electron density nem≤1.2 and the initial abundance of heavy ions Cb0 ≤ 0.1. The parallel phase speed of the waves increases with larger q.

  17. Nonthermal plasma reactors for the production of light hydrocarbon olefins from heavy oil

    Directory of Open Access Journals (Sweden)

    Prieto G.

    2003-01-01

    Full Text Available During the last decade, nonthermal plasma technology was applied in many different fields, focusing attention on the destruction of harmful compounds in the air. This paper deals with nonthermal plasma reactors for the conversion of heavy oil into light hydrocarbon olefins, to be employed as gasoline components or to be added in small amounts for the catalytic reduction of nitrogen oxide compounds in the treatment of exhaust gas at power plants. For the process, the plate-plate nonthermal plasma reactor driven by AC high voltage was selected. The reactor was modeled as a function of parameter characteristics, using the methodology provided by the statistical experimental design. The parameters studied were gap distance between electrodes, carrier gas flow and applied power. Results indicate that the reactions occurring in the process of heavy oil conversion have an important selective behavior. The products obtained were C1-C4 hydrocarbons with ethylene as the main compound. Operating the parameters of the reactor within the established operative window of the system and close to the optimum conditions, efficiencies as high as 70 (mul/joule were obtained. These values validate the process as an in-situ method to produce light olefins for the treatment of nitrogen oxides in the exhaust gas from diesel engines.

  18. Energy Loss of a Heavy Fermion in an Anisotropic QED Plasma

    CERN Document Server

    Romatschke, P; Romatschke, Paul; Strickland, Michael

    2004-01-01

    We compute the leading-order collisional energy loss of a heavy fermion propagating in a QED plasma with an electron distribution function which is anisotropic in momentum space. We show that in the presence of such anisotropies there can be a significant directional dependence of the heavy fermion energy loss with the effect being quite large for highly-relativistic velocities. We also repeat the analysis of the isotropic case more carefully and show that the final result depends on the intermediate scale used to separate hard and soft contributions to the energy loss. We then show that the canonical isotropic result is obtained in the weak-coupling limit. For intermediate-coupling we use the residual scale dependence as a measure of our theoretical uncertainty. We also discuss complications which could arise due to the presence of unstable soft photonic modes and demonstrate that the calculation of the energy loss is safe.

  19. Plasma neurofilament heavy chain is not a useful biomarker in Charcot-Marie-Tooth disease.

    Science.gov (United States)

    Rossor, Alexander M; Liu, Ching-Hua; Petzold, Axel; Malaspina, Andreas; Laura, Matilde; Greensmith, Linda; Reilly, Mary M

    2016-06-01

    The negative results in trials of vitamin C in Charcot-Marie-Tooth disease (CMT) type 1A have highlighted the lack of sensitive outcome measures. Neurofilaments are abundant neuronal cytoskeletal proteins, and their concentration in blood is likely to reflect axonal breakdown. We therefore examined plasma neurofilament heavy-chain (NfH) concentration as a potential biomarker in CMT. Blood samples were collected from healthy controls and patients with CMT over a 2-year period. Disease severity was measured using the CMT Examination Score. An in-house enzyme-linked immunoabsorbent assay was used to measure plasma NfH levels. There was no significant difference in plasma NfH concentrations between CMT patients and controls (P = 0.449). There was also no significant difference in plasma NfH levels in the CMT group over 1 year (mean difference = -0.02, SEM = 4.44, P = 0.98). Plasma NfH levels are not altered in patients with CMT and are not a suitable biomarker of disease activity. Muscle Nerve 53: 972-975, 2016. © 2016 Wiley Periodicals, Inc.

  20. Influence of substrate pre-treatments by Xe{sup +} ion bombardment and plasma nitriding on the behavior of TiN coatings deposited by plasma reactive sputtering on 100Cr6 steel

    Energy Technology Data Exchange (ETDEWEB)

    Vales, S., E-mail: sandra.vales@usp.br [Universidade de São Paulo (USP), Escola de Engenharia de São Carlos, Av. Trabalhador São Carlense 400, São Carlos, SP CEP 13566-590 (Brazil); Brito, P., E-mail: ppbrito@gmail.com [Pontifícia Universidade Católica de Minas Gerais (PUC-MG), Av. Dom José Gaspar 500, 30535-901 Belo Horizonte, MG (Brazil); Pineda, F.A.G., E-mail: pipe8219@gmail.com [Universidade de São Paulo (USP), Escola de Engenharia de São Carlos, Av. Trabalhador São Carlense 400, São Carlos, SP CEP 13566-590 (Brazil); Ochoa, E.A., E-mail: abigail_ochoa@hotmail.com [Universidade Estadual de Campinas (UNICAMP), Campus Universitário Zeferino Vaz, Barão Geraldo, Campinas, SP CEP 13083-970 (Brazil); Droppa, R., E-mail: roosevelt.droppa@ufabc.edu.br [Universidade Federal do ABC (UFABC), Av. dos Estados, 5001, Santo André, SP CEP 09210-580 (Brazil); Garcia, J., E-mail: jose.garcia@sandvik.com [Sandvik Coromant R& D, Lerkrogsvägen 19, SE-12680, Stockholm (Sweden); Morales, M., E-mail: monieriz@gmail.com [Universidade Estadual de Campinas (UNICAMP), Campus Universitário Zeferino Vaz, Barão Geraldo, Campinas, SP CEP 13083-970 (Brazil); Alvarez, F., E-mail: alvarez@ifi.unicamp.br [Universidade Estadual de Campinas (UNICAMP), Campus Universitário Zeferino Vaz, Barão Geraldo, Campinas, SP CEP 13083-970 (Brazil); and others

    2016-07-01

    In this paper the influence of pre-treating a 100Cr6 steel surface by Xe{sup +} ion bombardment and plasma nitriding at low temperature (380 °C) on the roughness, wear resistance and residual stresses of thin TiN coatings deposited by reactive IBAD was investigated. The Xe{sup +} ion bombardment was carried out using a 1.0 keV kinetic energy by a broad ion beam assistance deposition (IBAD, Kaufman cell). The results showed that in the studied experimental conditions the ion bombardment intensifies nitrogen diffusion by creating lattice imperfections, stress, and increasing roughness. In case of the combined pre-treatment with Xe{sup +} ion bombardment and subsequent plasma nitriding, the samples evolved relatively high average roughness and the wear volume increased in comparison to the substrates exposed to only nitriding or ion bombardment. - Highlights: • Effect of Xe ion bombardment and plasma nitriding on TiN coatings was investigated. • Xe ion bombardment with 1.0 KeV increases nitrogen retention in plasma nitriding. • 1.0 KeV ion impact energy causes sputtering, thus increasing surface roughness. • TiN coating wear is minimum after plasma nitriding due to lowest roughness.

  1. On the pressure effect in energetic deposition of Cu thin films by modulated pulsed power magnetron sputtering: A global plasma model and experiments

    Science.gov (United States)

    Zheng, B. C.; Meng, D.; Che, H. L.; Lei, M. K.

    2015-05-01

    The modulated pulsed power magnetron sputtering (MPPMS) discharge processes are numerically modeled and experimentally investigated, in order to explore the effect of the pressure on MPPMS discharges as well as on the microstructure of the deposited thin films. A global plasma model has been developed based on a volume-averaged global description of the ionization region, considering the loss of electrons by cross-B diffusion. The temporal variations of internal plasma parameters at different pressures from 0.1 to 0.7 Pa are obtained by fitting the model to duplicate the experimental discharge data, and Cu thin films are deposited by MPPMS at the corresponding pressures. The surface morphology, grain size and orientation, and microstructure of the deposited thin films are investigated by scanning electron microscopy, transmission electron microscopy, and x-ray diffraction. By increasing the pressure from 0.1 to 0.7 Pa, both the ion bombardment energy and substrate temperature which are estimated by the modeled plasma parameters decrease, corresponding to the observed transition of the deposited thin films from a void free structure with a wide distribution of grain size (zone T) into an underdense structure with a fine fiber texture (zone 1) in the extended structure zone diagram (SZD). The microstructure and texture transition of Cu thin films are well-explained by the extended SZD, suggesting that the primary plasma processes are properly incorporated in the model. The results contribute to the understanding of the characteristics of MPPMS discharges, as well as its correlation with the microstructure and texture of deposited Cu thin films.

  2. Anisotropic high-k deposition for gate-last processing of metal-oxide-semiconductor field-effect transistor utilizing electron-cyclotron-resonance plasma sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Kikuchi, Yoshiaki, E-mail: kikuchi.y.ao@m.titech.ac.jp; Gao, Jun; Sano, Takahiro; Ohmi, Shun-ichiro, E-mail: ohmi@ep.titech.ac.jp

    2012-01-31

    A high-k/metal gate structure has been investigated for application to state-of-the-art metal-oxide-semiconductor field-effect transistors. In the high-k/metal gate structure, the 32-nm technology node was realized by using the high-k-last, metal-last integration process. We investigated anisotropic deposition for 3-dimensional gate structures on Si substrates utilizing electron-cyclotron-resonance plasma sputtering to reduce parasitic capacitance. Anisotropic HfN film deposition was realized and the deposition thickness on the side wall was reduced with decreasing sputtering gas pressure, from 0.15 to 0.06 Pa, corresponding to Ar/N{sub 2} flow ratios of 20/1 and 5/1 sccm. The HfSiON gate insulator formed from the anisotropically deposited HfN film showed an equivalent-oxide-thickness of 2.1 nm and a gate leakage of 3.1 Multiplication-Sign 10{sup -6}A/cm{sup 2} at V{sub FB}-1.0. - Highlights: Black-Right-Pointing-Pointer High-k film deposition was controlled by the deposition pressure. Black-Right-Pointing-Pointer The pressure decreases with a reduction of gas flow rate during the high-k film deposition. Black-Right-Pointing-Pointer A flat band voltage shows negative shifts with reduction of gas flow rates. Black-Right-Pointing-Pointer A reason of the flat band voltage shift is an increase in Si-N bonding.

  3. Heavy Ions at LHC: A Quest for Quark-Gluon Plasma

    CERN Document Server

    Bhalerao, Rajeev S

    2008-01-01

    Quantum Chromo Dynamics (QCD), the theory of strong interactions, predicts a transition of the usual matter to a new phase of matter, called Quark-Gluon Plasma (QGP), at sufficiently high temperatures. The non-perturbative technique of defining a theory on a space-time lattice has been used to obtain this and other predictions about the nature of QGP. Heavy ion collisions at the Large Hadron Collider in CERN can potentially test these predictions and thereby test our theoretical understanding of confinement. This brief review aims at providing a glimpse of both these aspects of QGP.

  4. Estimation of electric conductivity of the quark gluon plasma via asymmetric heavy-ion collisions

    CERN Document Server

    Hirono, Yuji; Hirano, Tetsufumi

    2012-01-01

    We show that in asymmetric heavy-ion collisions, especially off-central Cu+Au collisions, a sizable strength of electric field directed from Au nucleus to Cu nucleus is generated in the overlapping region, because of the difference in the number of electric charges between the two nuclei. This electric field would induce an electric current in the matter created after the collision, which result in a dipole deformation of the charge distribution. The directed flow parameters $v_1^{\\pm}$ of charged particles turn out to be sensitive to the charge dipole and provide us with information about electric conductivity of the quark gluon plasma.

  5. Dynamics of quark-gluon plasma produced in heavy ion collisions

    Directory of Open Access Journals (Sweden)

    Ruggieri M.

    2014-01-01

    Full Text Available In this talk, we report on our results about the computation of isotropization and thermalization times of the quark-gluon plasma produced in relativistic heavy ion collisions, as well as of the elliptic flow. Simulation of the evolving fireball is achieved by solving the relativistic Boltzmann equation for the parton distribution function tuned at a fixed shear viscosity to entropy density ratio η/s. Our results show that the saturation in the initial spectrum reduces the efficiency in building-up the elliptic flow. Moreover both thermalization and isotropization times are quite small, approximately of 1 fm/c, if the system is in a strong coupling regime.

  6. Plasma channel and Z-pinch dynamics for heavy ion transport

    Energy Technology Data Exchange (ETDEWEB)

    Ponce-Marquez, David [Univ. of California, Berkeley, CA (United States)

    2002-01-01

    A self stabilized, free standing, z-pinch plasma channel has been proposed to deliver the high intensity heavy ion beam from the end of a driver to the fuel target in a heavy ion inertial fusion power plant. The z-pinch relaxes emittance and energy spread requirements requiring a lower cost driver. A z-pinch transport would reduce the number of beam entry port holes to the target chamber from over a hundred to four as compared to neutralized ballistic focusing thus reducing the driver hardware exposure to neutron flux. Experiments where a double pulse discharge technique is used, z-pinch plasma channels with enhanced stability are achieved. Typical parameters are 7 kV pre-pulse discharge and 30 kV main bank discharge with 50 kA of channel current in a 7 torr background gas atmosphere. This work is an experimental study of these plasma channels examining the relevant physics necessary to understand and model such plasmas. Laser diagnostics measured the dynamical properties of neutrals and plasma. Schlieren and phase contrast techniques probe the pre-pulse gas dynamics and infrared interferometry and faraday effect polarimetry are used on the z-pinch to study its electron density and current distribution. Stability and repeatability of the z-pinch depend on the initial conditions set by the pre-pulse. Results show that the z-pinch channel is wall stabilized by an on-axis gas density depression created by the pre-pulse through hydrodynamic expansion where the ratio of the initial gas density to the final gas density is > 10/1. The low on-axis density favors avalanching along the desired path for the main bank discharge. Pinch time is around 2 s from the main bank discharge initiation with a FWHM of ~ 2 cm. Results also show that typical main bank discharge plasma densities reach 1017 cm-3 peak on axis for a 30 kV, 7 torr gas nitrogen discharge. Current rise time is limited by the circuit-channel inductance with the highest contribution to the

  7. Plasma channel and Z-pinch dynamics for heavy ion transport

    Energy Technology Data Exchange (ETDEWEB)

    Ponce-Marquez, David

    2002-07-09

    A self stabilized, free standing, z-pinch plasma channel has been proposed to deliver the high intensity heavy ion beam from the end of a driver to the fuel target in a heavy ion inertial fusion power plant. The z-pinch relaxes emittance and energy spread requirements requiring a lower cost driver. A z-pinch transport would reduce the number of beam entry port holes to the target chamber from over a hundred to four as compared to neutralized ballistic focusing thus reducing the driver hardware exposure to neutron flux. Experiments where a double pulse discharge technique is used, z-pinch plasma channels with enhanced stability are achieved. Typical parameters are 7 kV pre-pulse discharge and 30 kV main bank discharge with 50 kA of channel current in a 7 torr background gas atmosphere. This work is an experimental study of these plasma channels examining the relevant physics necessary to understand and model such plasmas. Laser diagnostics measured the dynamical properties of neutrals and plasma. Schlieren and phase contrast techniques probe the pre-pulse gas dynamics and infrared interferometry and faraday effect polarimetry are used on the z-pinch to study its electron density and current distribution. Stability and repeatability of the z-pinch depend on the initial conditions set by the pre-pulse. Results show that the z-pinch channel is wall stabilized by an on-axis gas density depression created by the pre-pulse through hydrodynamic expansion where the ratio of the initial gas density to the final gas density is > 10/1. The low on-axis density favors avalanching along the desired path for the main bank discharge. Pinch time is around 2 s from the main bank discharge initiation with a FWHM of {approx} 2 cm. Results also show that typical main bank discharge plasma densities reach 10{sup 17} cm{sup -3} peak on axis for a 30 kV, 7 torr gas nitrogen discharge. Current rise time is limited by the circuit-channel inductance with the highest contribution to the

  8. Stoichiometric silicon oxynitride thin films reactively sputtered in Ar/N2O plasmas by HiPIMS

    Science.gov (United States)

    Hänninen, Tuomas; Schmidt, Susann; Wissting, Jonas; Jensen, Jens; Hultman, Lars; Högberg, Hans

    2016-04-01

    Silicon oxynitride (SiO x N y , x=0.2-1.3, y=0.2 -0.7) thin films were synthesized by reactive high power impulse magnetron sputtering from a pure silicon target in Ar/N2O atmospheres. It was found that the composition of the material can be controlled by the reactive gas flow and the average target power. X-ray photoelectron spectroscopy (XPS) shows that high average powers result in more silicon-rich films, while lower target powers yield silicon-oxide-like material due to more pronounced target poisoning. The amount of nitrogen in the films can be controlled by the percentage of nitrous oxide in the working gas. The nitrogen content remains at a constant level while the target is operated in the transition region between metallic and poisoned target surface conditions. The extent of target poisoning is gauged by the changes in peak target current under the different deposition conditions. XPS also shows that varying concentrations and ratios of oxygen and nitrogen in the films result in film chemical bonding structures ranging from silicon-rich to stoichiometric silicon oxynitrides having no observable Si-Si bond contributions. Spectroscopic ellipsometry shows that the film optical properties depend on the amount and ratio of oxygen and nitrogen in the compound, with film refractive indices measured at 633 nm ranging between those of SiO2 and Si3N4.

  9. Linear and nonlinear optical properties of functionalized CdSe quantum dots prepared by plasma sputtering and wet chemistry.

    Science.gov (United States)

    Humbert, Christophe; Dahi, Abdellatif; Dalstein, Laetitia; Busson, Bertrand; Lismont, Marjorie; Colson, Pierre; Dreesen, Laurent

    2015-05-01

    We develop an innovative manufacturing process, based on radio-frequency magnetron sputtering (RFMS), to prepare neat CdSe quantum dots (QDs) on glass and silicon substrates and further chemically functionalize them. In order to validate the fabrication protocol, their optical properties are compared with those of QDs obtained from commercial solutions and deposited by wet chemistry on the substrates. Firstly, AFM measurements attest that nano-objects with a mean diameter around 13 nm are located on the substrate after RFMS treatment. Secondly, the UV-Vis absorption study of this deposited layer shows a specific optical absorption band, located at 550 nm, which is related to a discrete energy level of QDs. Thirdly, by using two-color sum-frequency generation (2C-SFG) nonlinear optical spectroscopy, we show experimentally the functionalization efficiency of the RFMS CdSe QDs layer with thiol derived molecules, which is not possible on the QDs layer prepared by wet chemistry due to the surfactant molecules from the native solution. Finally, 2C-SFG spectroscopy, performed at different visible wavelengths, highlights modifications of the vibration mode shape whatever the QDs deposition method, which is correlated to the discrete energy level of the QDs.

  10. Measurement of the energy loss of heavy ions in laser-produced plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Knobloch-Maas, Renate

    2009-11-25

    The interaction of ions with plasma is not yet fully understood today, although it is important for inertial fusion technology. During recent years, the energy loss of heavy ions in plasma has therefore been a subject of research in the Laser and Plasma Physics group of Darmstadt University of Technology. Several experiments were carried out at the Gesellschaft fuer Schwerionenforschung (GSI) in Darmstadt using laser-created plasma, thereby taking advantage of the unique combination of GSI's accelerator facility and the laser system nhelix, which is also described in this work. The experiments focus on the measurement of the energy loss of medium heavy ions in a plasma created by directly heating a thin carbon foil with the nhelix laser, at an energy of about 50 J. In order to measure the energy loss using a time-of-flight method, a stop detector is used to register the arrival of the ion pulses after passing the plasma and a 12 m drift space. At the beginning of the work on this thesis, the ion detector types formerly used were found to be inadequately suited to the difficult task; this was changed during this thesis. The ion detector has to be able to temporarily resolve ion pulses with a frequency of 108 MHz and a width (FWHM) of 3 ns at a very low current. It also has to withstand the X-ray burst from the plasma with a dead time shorter than the difference between the X-ray and the ion time of flight between the plasma and the detector. In order to satisfy these and other demands, a new diamond detector was designed and has now been used for several measurements. In addition to the new detector, other improvements were made concerning the diagnostics and the laser. The laser-created plasma now reaches a maximum temperature exceeding 200 eV and a free electron density of up to 10{sup 22} cm{sup -3}. With this greatly improved setup, energy loss data could be obtained with a temporal resolution several times better than before, using an ion beam with a

  11. Flexible Solar Cells Using Doped Crystalline Si Film Prepared by Self-Biased Sputtering Solid Doping Source in SiCl4/H2 Microwave Plasma.

    Science.gov (United States)

    Hsieh, Ping-Yen; Lee, Chi-Young; Tai, Nyan-Hwa

    2016-02-01

    We developed an innovative approach of self-biased sputtering solid doping source process to synthesize doped crystalline Si film on flexible polyimide (PI) substrate via microwave-plasma-enhanced chemical vapor deposition (MWPECVD) using SiCl4/H2 mixture. In this process, P dopants or B dopants were introduced by sputtering the solid doping target through charged-ion bombardment in situ during high-density microwave plasma deposition. A strong correlation between the number of solid doping targets and the characteristics of doped Si films was investigated in detail. The results show that both P- and B-doped crystalline Si films possessed a dense columnar structure, and the crystallinity of these structures decreased with increasing the number of solid doping targets. The films also exhibited a high growth rate (>4.0 nm/s). Under optimal conditions, the maximum conductivity and corresponding carrier concentration were, respectively, 9.48 S/cm and 1.2 × 10(20) cm(-3) for P-doped Si film and 7.83 S/cm and 1.5 × 10(20) cm(-3) for B-doped Si film. Such high values indicate that the incorporation of dopant with high doping efficiency (around 40%) into the Si films was achieved regardless of solid doping sources used. Furthermore, a flexible crystalline Si film solar cell with substrate configuration was fabricated by using the structure of PI/Mo film/n-type Si film/i-type Si film/p-type Si film/ITO film/Al grid film. The best solar cell performance was obtained with an open-circuit voltage of 0.54 V, short-circuit current density of 19.18 mA/cm(2), fill factor of 0.65, and high energy conversion of 6.75%. According to the results of bending tests, the critical radius of curvature (RC) was 12.4 mm, and the loss of efficiency was less than 1% after the cyclic bending test for 100 cycles at RC, indicating superior flexibility and bending durability. These results represent important steps toward a low-cost approach to high-performance flexible crystalline Si film

  12. The errant life of a heavy quark in the quark-gluon plasma

    CERN Document Server

    Meyer, Harvey B

    2010-01-01

    In the high-temperature phase of QCD, the heavy quark momentum diffusion constant determines, via a fluctuation-dissipation relation, how fast a heavy quark kinetically equilibrates. This transport coefficient can be extracted from thermal correlators via a Kubo formula. We present a lattice calculation of the relevant Euclidean correlators in the gluon plasma, based on a recent formulation of the problem in heavy-quark effective field theory (HQET). We find a $\\approx20%$ enhancement of the Euclidean correlator at maximal time separation as the temperature is lowered from $6T_c$ to $2T_c$, pointing to stronger interactions at lower temperatures. At the same time, the correlator becomes flatter from $6T_c$ down to $2T_c$, indicating a relative shift of the spectral weight to lower frequencies. A recent next-to-leading order perturbative calculation of the correlator agrees with the time dependence of the lattice data at the few-percent level. We estimate how much additional contribution from the $\\omega\\lesss...

  13. Initial energy density of quark-gluon plasma in relativistic heavy-ion collisions

    Energy Technology Data Exchange (ETDEWEB)

    Wong, C.Y.

    1984-01-01

    Recently, there has been considerable interest in the central rapidity region of highly relativistic heavy-ion collisions. Such an interest stems from the possibility of creating hadron matter of high energy density which may exceed the critical energy density for a phase transition between ordinary confined matter and the unconfined quark-gluon plasma. The experimental searches and identification of the quark-gluon plasma may provide a new insight into the question of quark confinement. The estimate of the initial energy density is quite uncertain. The initial energy density is nonetheless an important physical quantity. It is one of the factors which determines whether the produced matter can undergo phase transition or not. The energy density has been estimated previously by using the color neutralization model of Brodsky et al. However, the color neutralization model gives a central rapidity multiplicity in heavy-ion collision too low by a factor of two. For this reason, we wish to obtain a better estimate of the energy density (in the central rapidity region). As is well known, a simple Glauber-type multiple collision model can reproduce the total multiplicity and multiplicity plateau near the central rapidity region to within 30%. The simple multiple collision model has an approximate validity as a gross description of the reaction process. We shall adopt a semiempirical approach. Using the multiple collision model and the thickness function of Glauber, we obtain analytical functional form for all the quantities in question. A single parameter, r/sub rms/, is adjusted to fit the experimental central rapidity multiplicity data. The semi-empirical results provide a useful tool to extrapolate to the unknown central rapidity region of heavy-ion collisions.

  14. Transport of Sputtered Particles in Capacitive Sputter Sources

    CERN Document Server

    Trieschmann, Jan

    2015-01-01

    The transport of sputtered aluminum inside a multi frequency capacitively coupled plasma chamber is simulated by means of a kinetic test multi-particle approach. A novel consistent set of scattering parameters obtained for a modified variable hard sphere collision model is presented for both argon and aluminum. An angular dependent Thompson energy distribution is fitted to results from Monte-Carlo simulations and used for the kinetic simulation of the transport of sputtered aluminum. For the proposed configuration the transport of sputtered particles is characterized under typical process conditions at a gas pressure of p = 0.5 Pa. It is found that - due to the peculiar geometric conditions - the transport can be understood in a one dimensional picture, governed by the interaction of the imposed and backscattered particle fluxes. It is shown that the precise geometric features play an important role only in proximity to the electrode edges, where the effect of backscattering from the outside chamber volume be...

  15. Direct dynamic synthesis of nanodispersed phases of titanium oxides upon sputtering of electrodischarge titanium plasma into an air atmosphere

    Science.gov (United States)

    Sivkov, A. A.; Gerasimov, D. Yu.; Nikitin, D. S.

    2017-01-01

    Experimental investigations of the possibility of directly synthesizing nanodispersed crystalline phases of titanium dioxides with rutile and anatase structures in a hypervelocity jet of electroerosion plasma generated by a coaxial magnetoplasma accelerator with titanium electrodes are presented. A powder product containing nanosized polymorphic phases of titanium dioxide with a spherical shape of particles has been manufactured.

  16. Sputtering and surface damage of TFTR protective plate materials (Mo, TZM, graphite) by energetic D/sup +/ ion irradiation. Final report for Princeton Plasma Physics Laboratory

    Energy Technology Data Exchange (ETDEWEB)

    Kaminsky, M.; Das, S.K.; Dusza, P.

    1978-03-01

    Studies have been conducted in accordance with a service request from the Plasma Physics Laboratory (PPPL) of Princeton University to determine the total sputtering yields and the surface damage of molybdenum (a candidate material for the neutral beam injector protective plate for Princeton's Fusion Test Reactor (TFTR)) caused by the impact of D/sup +/ ions at 120-keV, 60-keV and 40-keV at fluxes and total doses agreed upon between PPPL and ANL. The irradiations have been conducted in a specified pulsed mode as well as in a dc mode. The material TZM (a molybdenum alloy) was included in some tests of surface damage, but not for the full complement of doses planned for molybdenum. According to a request by PPPL the target temperature was not to be controlled (targets were allowed to reach a temperature determined by the beam power deposition and the conductive and radiative heat losses), but the target temperature was to be monitored. The irradiations were conducted at pressures ranging from 4 x 10/sup -9/ torr to 2 x 10/sup -8/ torr.

  17. In situ plasma sputtering synthesis of ZnO nanorods-Ag nanoparticles hybrids and their application in non-enzymatic hydrogen peroxide sensing.

    Science.gov (United States)

    Zhang, Dan; Zhang, Yuxia; Yang, Chi; Ge, Cunwang; Wang, Yuanhong; Wang, Hao; Liu, Hongying

    2015-08-21

    In this paper, ZnO nanorods-Ag nanoparticles hybrids were first synthesized via a facile, rapid, and in situ plasma sputtering method without using any silver precursor. The obtained materials were then characterized by scanning electron microscopy, high-resolution transmission electron microscopy, energy-dispersive x-ray spectroscopy, and cyclic voltammetry. Based on the electrochemical catalytic properties of the obtained nanohybrids, a non-enzymatic hydrogen peroxide biosensor was constructed by immobilizing the obtained ZnO nanorods-Ag nanoparticles hybrids on the surface of a glassy carbon electrode. Under optimal conditions, the resulting biosensor displayed a good response for H2O2 with a linear range of 0.2 to 12.8 mM, and a detection limit of 7.8 μM at a signal-to-noise ratio of 3. In addition, it exhibited excellent anti-interference ability and fast response. The current work provides a feasible platform to fabricate a variety of non-enzymatic biosensors.

  18. In situ plasma sputtering synthesis of ZnO nanorods-Ag nanoparticles hybrids and their application in non-enzymatic hydrogen peroxide sensing

    Science.gov (United States)

    Zhang, Dan; Zhang, Yuxia; Yang, Chi; Ge, Cunwang; Wang, Yuanhong; Wang, Hao; Liu, Hongying

    2015-08-01

    In this paper, ZnO nanorods-Ag nanoparticles hybrids were first synthesized via a facile, rapid, and in situ plasma sputtering method without using any silver precursor. The obtained materials were then characterized by scanning electron microscopy, high-resolution transmission electron microscopy, energy-dispersive x-ray spectroscopy, and cyclic voltammetry. Based on the electrochemical catalytic properties of the obtained nanohybrids, a non-enzymatic hydrogen peroxide biosensor was constructed by immobilizing the obtained ZnO nanorods-Ag nanoparticles hybrids on the surface of a glassy carbon electrode. Under optimal conditions, the resulting biosensor displayed a good response for H2O2 with a linear range of 0.2 to 12.8 mM, and a detection limit of 7.8 μM at a signal-to-noise ratio of 3. In addition, it exhibited excellent anti-interference ability and fast response. The current work provides a feasible platform to fabricate a variety of non-enzymatic biosensors.

  19. Giotto data analysis: Electron plasma and heavy ion composition measurements at Comet Halley

    Science.gov (United States)

    Lin, Robert P.

    1992-01-01

    This investigation involved the analysis of electron plasma and heavy ion composition measurements made by the COPERNIC (COmplete Positive ion, Electron, and Ram Negative Ion measurements near Comet Halley) plasma experiment during the close fly-by of Halley by the European Space Agency's Giotto spacecraft. The experiment provided measurements of the full 3-dimensional distribution of 10 eV-30 keV electrons, and mass analysis of cold cometary ions from 10-210 amu. The analysis of the COPERNIC data has yielded some remarkable results, including: The discovery of negatively charged ions in the inner coma; the discovery of far heavier (mass is greater than 50 amu) ions than predicted, dominated by complex molecular ions made up of C, H, O, and N; the discovery of an adiabatic heating effect on electrons from the compression of the solar wind plasma; the identification of several organic and sulfur bearing ions; and the discovery of a new 'mystery region' where electrons are accelerated to high energies. These discoveries were in addition to the detailed analysis of 'expected' features at Comet Halley. Although this grant has expired, analysis continues on the data at a low (unfunded) level, and it is expected that more significant results will be obtained. A bibliography of the papers resulting from this research is attached, and a copy of each paper is included.

  20. "Chemical" composition of the Quark-Gluon Plasma in relativistic heavy-ion collisions

    CERN Document Server

    Scardina, F; Plumari, S; Greco, V

    2012-01-01

    We study the evolution of the quark-gluon composition of the plasma created in ultra-Relativistic Heavy Ion Collisions (uRHIC's) employing a partonic transport theory that includes both elastic and inelastic collisions plus a mean fields dynamics associated to the widely used quasi-particle model. The latter, able to describe lattice QCD thermodynamics, implies a "chemical" equilibrium ratio between quarks and gluons strongly increasing as $T\\rightarrow T_c$, the phase transition temperature. Accordingly we see in realistic simulations of uRHIC's a rapid evolution from a gluon dominated initial state to a quark dominated plasma close to $T_c$. The quark to gluon ratio can be modified by about a factor of $\\sim 20$ in the bulk of the system and appears to be large also in the high $p_T$ region. We discuss how this aspect, often overflown, can be essential for a quantitative study of several key issues in the QGP physics: shear viscosity, jet quenching, quarkonia suppression. Furthemore a bulk plasma made by mo...

  1. Heavy ion beam probing—diagnostics to study potential and turbulence in toroidal plasmas

    Science.gov (United States)

    Melnikov, A. V.; Krupnik, L. I.; Eliseev, L. G.; Barcala, J. M.; Bravo, A.; Chmyga, A. A.; Deshko, G. N.; Drabinskij, M. A.; Hidalgo, C.; Khabanov, P. O.; Khrebtov, S. M.; Kharchev, N. K.; Komarov, A. D.; Kozachek, A. S.; Lopez, J.; Lysenko, S. E.; Martin, G.; Molinero, A.; de Pablos, J. L.; Soleto, A.; Ufimtsev, M. V.; Zenin, V. N.; Zhezhera, A. I.; T-10 Team; TJ-II Team

    2017-07-01

    Heavy ion beam probing (HIBP) is a unique diagnostics to study the core plasma potential and turbulence. Advanced HIBPs operate in the T-10 tokamak and TJ-II flexible heliac with fine focused (magnetic configurations with ECR and neutral beam injection (NBI) heating at TJ-II. Time evolution of the radial profiles and/or local values of plasma parameters from high field side (HFS) to low field side (LFS), -1  magnetic field B pol (by the beam toroidal shift), poloidal electric filed E pol that allows one to derive the electrostatic turbulent particle flux ΓE×B. The cross-phase of density oscillations produces the phase velocity of their poloidal propagation or rotation; also it gives the poloidal mode number. Dual HIBP, consisting of two identical HIBPs located ¼ torus apart provide the long-range correlations of core plasma parameters. Low-noise high-gain electronics allows us to study broadband turbulence and quasi-coherent modes like geodesic acoustic modes and Alfvén eigenmodes.

  2. Synthesis and annealing effects on the properties of nanostructured Ti–Al–V–N coatings deposited by plasma enhanced magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Abd El-Rahman, A.M., E-mail: ahmedphys96@hotmail.com [Physics Department, Faculty of Science, Sohag University, 82524 Sohag (Egypt); Mechanical and Materials Engineering Division, Southwest Research Institute, 6220 Culebra Road, San Antonio, TX 78238 (United States)

    2015-01-15

    In the present study, Ti–Al–V–N coatings were synthesized onto Ti–6Al–4V substrates by plasma enhanced magnetron sputtering (PEMS) of two commercial sputter targets of Ti–6Al–4V in an Ar/N{sub 2} gas mixture. After that, the as-synthesized coatings were annealed in air atmosphere at temperature ranging from 500 °C to 900 °C. The as-synthesized and annealed coatings were characterized by X-ray diffraction, Vickers microhardness tester, ball-on-disk tribometer and potentiodynamic polarization tests. The as-synthesized coatings showed a surface hardness of about 2980 ± 80 HV{sub 0.3} and a friction coefficient of 0.36. It has been revealed with the increase of annealing temperature; the microhardness was gradually decreased and reached a minimum value of 1030 ± 30 HV{sub 0.3} at 900 °C. The coefficient of friction has a minimum value of 0.27 for coatings annealed at 600 °C. Potentiodynamic polarization test confirmed that thermally annealed samples (≤600 °C) exhibit a better corrosion performance compared to that of the as-synthesized one. However, at relatively higher annealing temperature (700–900 °C), a small degradation in the corrosion performance was observed with the formation of oxidized phases. Finally, the variation in the mechanical and tribological properties of this coating with annealing temperatures is attributed to changes in microstructure and chemical nature of the surface layer. - Highlights: • Ti–Al–V–N coating was synthesized using PEMS and annealed in air atmosphere. • The microstructural, mechanical and tribological properties were evaluated. • The as-synthesized coating showed surface hardness of about 30 GPa. • Grain size and microstrain were obtained from microstructural data. • The annealed samples (≤600 °C) exhibit good thermal stability and better corrosion performance.

  3. Magnetron sputtering source

    Science.gov (United States)

    Makowiecki, Daniel M.; McKernan, Mark A.; Grabner, R. Fred; Ramsey, Philip B.

    1994-01-01

    A magnetron sputtering source for sputtering coating substrates includes a high thermal conductivity electrically insulating ceramic and magnetically attached sputter target which can eliminate vacuum sealing and direct fluid cooling of the cathode assembly. The magnetron sputtering source design results in greater compactness, improved operating characteristics, greater versatility, and low fabrication cost. The design easily retrofits most sputtering apparatuses and provides for safe, easy, and cost effective target replacement, installation, and removal.

  4. Nonperturbative heavy-quark diffusion in the quark-gluon plasma.

    Science.gov (United States)

    van Hees, H; Mannarelli, M; Greco, V; Rapp, R

    2008-05-16

    We evaluate heavy-quark (HQ) transport properties in a quark-gluon plasma (QGP) within a Brueckner many-body scheme employing interaction potentials extracted from thermal lattice QCD. The in-medium T matrices for elastic charm- and bottom-quark scattering off light quarks in the QGP are dominated by attractive meson and diquark channels which support resonance states up to temperatures of ~1.5T(c). The resulting drag coefficient increases with decreasing temperature, contrary to expectations based on perturbative QCD scattering. Employing relativistic Langevin simulations we compute HQ spectra and elliptic flow in sqrt[s(NN)]=200 GeV Au-Au collisions. A good agreement with electron decay data supports our nonperturbative computation of HQ diffusion, indicative for a strongly coupled QGP.

  5. Heavy-quark transport coefficients in a hot viscous quark-gluon plasma medium

    CERN Document Server

    Das, Santosh K; Alam, Jan-e

    2012-01-01

    The heavy-quark (HQ) transport coefficients have been estimated for a viscous quark-gluon plasma medium, utilizing a recently proposed quasi-particle description based on realistic QGP equation of state (EoS). Interactions entering through the equation of state significantly suppress the temperature dependence of the drag coefficient of QGP as compared to that of an ideal system of quarks and gluons. Inclusion of shear and bulk viscosities through the corrections to the thermal phase space factors of the bath particles alters the magnitude of the drag coefficient and the enhancement is significant at lower temperatures. The competition between the effects of realistic EoS and dissipative corrections through phase space factor the former eventually dictate how the drag coefficient would behave as a function of temperature, and how much quantitatively digress from the ideal case. The observations suggest significant impact of both the realistic equation of state, and the viscosities, on the HQs transport at RHI...

  6. Heavy metals in aromatic spices by inductively coupled plasma-mass spectrometry.

    Science.gov (United States)

    Bua, Daniel Giuseppe; Annuario, Giovanni; Albergamo, Ambrogina; Cicero, Nicola; Dugo, Giacomo

    2016-09-01

    Objective of this study was to determine the content of Cd, Hg, As and Pb in common spices traded in the Italian market, using inductively coupled plasma-mass spectrometry (ICP-MS). The results were compared with the maximum limits established by the national Legislative Decree (LD) no. 107 implementing the Council Directive 88/388/EEC and by international organisations, such as Food and Agriculture Organization (FAO) and World Health Organization (WHO). Food safety for spices was assessed considering the tolerable weekly intake (TWI) and the provisional tolerable weekly intake (PTWI), respectively, for Cd and Hg and the 95% lower confidence limit of the benchmark dose of 1% extra risk (BMDL01) for As and Pb. Investigated elements in all samples were within the maximum limits as set by the national and international normative institutions. Nevertheless, the heavy metal content of some spices exceeded the PTWI, TWI and BMDL01, which needs attention when considering consumer's health.

  7. Nanostructured plasma etched, magnetron sputtered nanolaminar Cr{sub 2}AlC MAX phase thin films

    Energy Technology Data Exchange (ETDEWEB)

    Grieseler, Rolf, E-mail: rolf.grieseler@tu-ilmenau.de [TU Ilmenau, Institute of Materials Engineering and Institute of Micro and Nanotechnologies MacroNano, Chair Materials for Electronics, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau (Germany); Hähnlein, Bernd; Stubenrauch, Mike [TU Ilmenau, Institute of Micro and Nanotechnologies MacroNano, Chair Nanotechnology, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau (Germany); Kups, Thomas [TU Ilmenau, Institute of Materials Engineering and Institute of Micro and Nanotechnologies MacroNano, Chair Materials for Electronics, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau (Germany); Wilke, Marcus [MFPA Weimar, Testing Center for Thin Films and Material Properties at TU Ilmenau, Gustav-Kirchhoff-Str. 5, Ilmenau (Germany); Hopfeld, Marcus [TU Ilmenau, Institute of Materials Engineering and Institute of Micro and Nanotechnologies MacroNano, Chair Materials for Electronics, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau (Germany); Pezoldt, Jörg [TU Ilmenau, Institute of Micro and Nanotechnologies MacroNano, Chair Nanotechnology, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau (Germany); Schaaf, Peter [TU Ilmenau, Institute of Materials Engineering and Institute of Micro and Nanotechnologies MacroNano, Chair Materials for Electronics, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau (Germany)

    2014-02-15

    The knowledge of the mechanical properties of new materials determines essentially their usability and functionality when used in micro- and nanostructures. MAX phases are new and highly interesting materials due to their unique combination of materials properties. In this article a new method for producing the Cr{sub 2}AlC MAX phase is presented. Thin film elemental multilayer deposition and subsequent rapid thermal annealing forms the MAX phase within seconds. Additionally, free standing microstructures (beams and cantilevers) based on this MAX phase films are prepared by plasma etching. The mechanical properties of these MAX phase microstructures are investigated.

  8. Hadron production in relativistic heavy ion interactions and the search for the quark-gluon plasma

    Energy Technology Data Exchange (ETDEWEB)

    Tannenbaum, M.J.

    1989-12-01

    The course starts with an introduction, from the experimentalist's point of view, of the challenge of measuring Relativistic Heavy Ion interactions. A review of some theoretical predictions for the expected signatures of the quark gluon plasma will be made, with a purpose to understand how they relate to quantities which may be experimentally measured. A short exposition of experimental techniques and details is given including charged particles in matter, momentum resolution, kinematics and Lorentz Transformations, calorimetry. Principles of particle identification including magnetic spectrometers, time of flight measurement. Illustrations using the E802 spectrometer and other measured results. Resolution smearing of spectra, and binning effects. Parent to daughter effects in decay, with {pi}{sup 0} {yields} {gamma} {gamma} as an example. The experimental situation from the known data in p -- p collisions and proton-nucleus reactions is reviewed and used as a basis for further discussions. The Cronin Effect'' and the Seagull Effect'' being two arcana worth noting. Then, selected experiments from the BNL and CERN heavy ion programs are discussed in detail. 118 refs., 45 figs.

  9. Heavy-quark transport coefficients in a hot viscous quark-gluon plasma medium

    Science.gov (United States)

    Das, Santosh K.; Chandra, Vinod; Alam, Jan-e.

    2014-01-01

    Heavy-quark (HQ) transport coefficients have been estimated for a viscous quark-gluon plasma (QGP) medium, utilizing a recently proposed quasi-particle description based on a realistic QGP equation of state (EoS). Interactions entering through the EoS significantly suppress the temperature dependence of the drag coefficient of QGP, compared to those of an ideal relativistic system of quarks and gluons. The inclusion of shear and bulk viscosities through the corrections to the thermal phase space factors of the bath particles alters the magnitude of the drag coefficient; the enhancement is significant at lower temperatures. In the competition between the effects of the EoS and dissipative corrections through phase space factors, the former eventually dictate how the drag coefficient would behave as a function of temperature and how much it quantitatively digresses from the ideal case. The observations suggest a significant impact of both the realistic EoS and the viscosities on the HQs transport at Relativistic Heavy Ion Collider and Large Hadron Collider collision energies.

  10. [Determination of Heavy Metal Elements in Diatomite Filter Aid by Inductively Coupled Plasma Mass Spectrometry].

    Science.gov (United States)

    Nie, Xi-du; Fu, Liang

    2015-11-01

    This study established a method for determining Be, Cr, Ni, As, Cd, Sb, Sn, Tl, Hg and Pb, total 10 heavy metals in diatomite filter aid. The diatomite filter aid was digested by using the mixture acid of HNO₃ + HF+ H₃PO₄ in microwave system, 10 heavy metals elements were determined by inductively coupled plasma mass spectrometry (ICP-MS). The interferences of mass spectrometry caused by the high silicon substrate were optimized, first the equipment parameters and isotopes of test metals were selected to eliminate these interferences, the methane was selected as reactant gas, and the mass spectral interferences were eliminated by dynamic reaction cell (DRC). Li, Sc, Y, In and Bi were selected as the internal standard elements to correct the interferences caused by matrix and the drift of sensitivity. The results show that the detection limits for analyte is in the range of 3.29-15.68 ng · L⁻¹, relative standard deviations (RSD) is less than 4.62%, and the recovery is in the range of 90.71%-107.22%. The current method has some advantages such as, high sensitivity, accurate, and precision, which can be used in diatomite filter aid quality control and safety estimations.

  11. Evolution of heavy quark distribution function on quark-gluon plasma: Using the Iterative Laplace Transform Method

    Directory of Open Access Journals (Sweden)

    Pari Sharareh Mehrabi

    2016-01-01

    Full Text Available The “Laplace Transform Method” is used to solve the Fokker-Plank equation for finding the time evolution of the heavy quarks distribution functions such as charm and bottom in quark gluon plasma. These solutions will lead us to calculation of nuclear suppression factor RAA. The results have good agreement with available experiment data from the PHENIX collaboration.

  12. Properties of cylindrical and spherical heavy ion-acoustic solitary and shock structures in a multispecies plasma with superthermal electrons

    Science.gov (United States)

    Shah, M. G.; Rahman, M. M.; Hossen, M. R.; Mamun, A. A.

    2016-02-01

    A theoretical investigation on heavy ion-acoustic (HIA) solitary and shock structures has been accomplished in an unmagnetized multispecies plasma consisting of inertialess kappa-distributed superthermal electrons, Boltzmann light ions, and adiabatic positively charged inertial heavy ions. Using the reductive perturbation technique, the nonplanar (cylindrical and spherical) Kortewg-de Vries (KdV) and Burgers equations have been derived. The solitary and shock wave solutions of the KdV and Burgers equations, respectively, have been numerically analyzed. The effects of superthermality of electrons, adiabaticity of heavy ions, and nonplanar geometry, which noticeably modify the basic features (viz. polarity, amplitude, phase speed, etc.) of small but finite amplitude HIA solitary and shock structures, have been carefully investigated. The HIA solitary and shock structures in nonplanar geometry have been found to distinctly differ from those in planar geometry. Novel features of our present attempt may contribute to the physics of nonlinear electrostatic perturbation in astrophysical and laboratory plasmas.

  13. A Linearized Boltzmann transport model for jet propagation in the quark-gluon plasma: Heavy quark evolution

    CERN Document Server

    Cao, Shanshan; Qin, Guang-You; Wang, Xin-Nian

    2016-01-01

    A Linearized Boltzmann Transport (LBT) model coupled with hydrodynamical background is established to describe the evolution of jet shower partons and medium excitations in high energy heavy-ion collisions. We extend the LBT model to include both elastic and inelastic processes for light and heavy partons in the quark-gluon plasma. A hybrid model of fragmentation and coalescence is developed for the hadronization of heavy quarks. Within this framework, we investigate how heavy flavor observables depend on various ingredients, such as different energy loss and hadronization mechanisms, the momentum and temperature dependences of the transport coefficients, and the radial flow of the expanding fireball. Our model calculations show good descriptions of $D$ meson suppression and elliptic flow observed at the LHC and RHIC. The prediction for the Pb-Pb collisions at $\\sqrt{s_\\mathrm{NN}}$=5.02 TeV is provided.

  14. Pulsed, Inductively Generated, Streaming Plasma Ion Source for Heavy Ion Fusion Linacs

    Energy Technology Data Exchange (ETDEWEB)

    Steven C. Glidden; Howard D Sanders; John B. Greenly; Daniel L. Dongwoo

    2006-04-28

    This report describes a compact, high current density, pulsed ion source, based on electrodeless, inductively driven gas breakdown, developed to meet the requirements on normalized emittance, current density, uniformity and pulse duration for an ion injector in a heavy-ion fusion driver. The plasma source produces >10 μs pulse of Argon plasma with ion current densities >100 mA/cm2 at 30 cm from the source and with strongly axially directed ion energy of about 80 eV, and sub-eV transverse temperature. The source has good reproducibility and spatial uniformity. Control of the current density during the pulse has been demonstrated with a novel modulator coil method which allows attenuation of the ion current density without significantly affecting the beam quality. This project was carried out in two phases. Phase 1 used source configurations adapted from light ion sources to demonstrate the feasibility of the concept. In Phase 2 the performance of the source was enhanced and quantified in greater detail, a modulator for controlling the pulse shape was developed, and experiments were conducted with the ions accelerated to >40 kV.

  15. On contribution of energetic and heavy ions to the plasma pressure: Storm Sept 27 - Oct 4, 2002

    Science.gov (United States)

    Kronberg, E. A.; Mouikis, C.; Kistler, L. M.; Dandouras, I. S.; Daly, P. W.; Welling, D. T.; Grigorenko, E. E.

    2015-12-01

    Contribution of the energetic ions (>> 40 keV) and of heavy ions into the total plasma pressure is often neglected. In this study we evaluate the contribution of these components for the storm observed from September 27 to October 4 in 2002. The thermal component of the pressure for the protons, helium and oxygen at 0--40 keV/q is measured by the Cluster/CIS/CODIF sensor. The contribution of the energetic ions at energies >> 40 keV is calculated from the Cluster/RAPID/IIMS observations. The results show that before the storm has initiated, the contribution of the energetic ions in to the total pressure is indeed negligible in the tail plasma sheet, less than ˜1%. However, with the storm development contribution of the energetic part becomes significant, up to ˜30%, towards the recovery phase and cannot be neglected. Heavy ions contribute to the 27% of the total pressure and half of them are energetic. The contribution of energetic ions to the pressure of the ring current (L≃5) is significant. The heavy ions play a dominant role in the plasma pressure, about 62% during the main phase of the magnetic storm. Half of them are energetic ions. The SWMF/BATS-R-US MHD model underestimates the contribution of the energetic and heavy ions in to the ion distribution in the magnetotail plasma sheet and the ring current. The ring current plasma pressure distorts the terrestrial internal magnetic field and defines magnetic storm. Therefore, it is essential to take in to account the contribution of the energetic and heavy ions.

  16. Low-loss interference filter arrays made by plasma-assisted reactive magnetron sputtering (PARMS) for high-performance multispectral imaging

    Science.gov (United States)

    Broßmann, Jan; Best, Thorsten; Bauer, Thomas; Jakobs, Stefan; Eisenhammer, Thomas

    2016-10-01

    Optical remote sensing of the earth from air and space typically utilizes several channels in the visible and near infrared spectrum. Thin-film optical interference filters, mostly of narrow bandpass type, are applied to select these channels. The filters are arranged in filter wheels, arrays of discrete stripe filters mounted in frames, or patterned arrays on a monolithic substrate. Such multi-channel filter assemblies can be mounted close to the detector, which allows a compact and lightweight camera design. Recent progress in image resolution and sensor sensitivity requires improvements of the optical filter performance. Higher demands placed on blocking in the UV and NIR and in between the spectral channels, in-band transmission and filter edge steepness as well as scattering lead to more complex filter coatings with thicknesses in the range of 10 - 25μm. Technological limits of the conventionally used ion-assisted evaporation process (IAD) can be overcome only by more precise and higher-energetic coating technologies like plasma-assisted reactive magnetron sputtering (PARMS) in combination with optical broadband monitoring. Optics Balzers has developed a photolithographic patterning process for coating thicknesses up to 15μm that is fully compatible with the advanced PARMS coating technology. This provides the possibility of depositing multiple complex high-performance filters on a monolithic substrate. We present an overview of the performance of recently developed filters with improved spectral performance designed for both monolithic filter-arrays and stripe filters mounted in frames. The pros and cons as well as the resulting limits of the filter designs for both configurations are discussed.

  17. Crossed contributions to electron and heavy-particle transport fluxes for magnetized plasmas in the continuum regime

    Science.gov (United States)

    Scoggins, James B.; Knisely, Carleton P.; Magin, Thierry E.

    2016-11-01

    We propose a unified fluid model for multicomponent plasmas in thermal nonequilibrium accounting for the influence of the electromagnetic field. In a previous work, this model was derived from kinetic theory based on a generalized Chapman-Enskog perturbative solution of the Boltzmann equation, scaled using the ratio of electron to heavy-particle masses. Anisotropic transport properties were derived in terms of bracket integrals. In this work, explicit expressions for asymptotic solutions of the transport properties are derived using a spectral Galerkin projection supplied with Laguerre-Sonine polynomial basis functions, and we analyze the crossed contributions to electron and heavy particle mass and energy fluxes, known as the Kolesnikov effect.

  18. A novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS)

    Science.gov (United States)

    Loch, D. A. L.; Ehiasarian, A. P.

    2012-09-01

    Sputtering magnetic materials with magnetron based systems has the disadvantage of field quenching and variation of alloy composition with target erosion. The advantage of eliminating magnetic fields in the chamber is that this enables sputtered particles to move along the electric field more uniformly. Inductively coupled impulse sputtering (ICIS) is a form of high power impulse magnetron sputtering (HIPIMS) without a magnetic field where a high density plasma is produced by a high power radio frequency (RF) coil in order to sputter the target and ionise the metal vapour. In this emerging technology, the effects of power and pressure on the ionisation and deposition process are not known. The setup comprises of a 13.56 MHz pulsed RF coil pulsed with a duty cycle of 25 %. A pulsed DC voltage of 1900 V was applied to the cathode to attract Argon ions and initiate sputtering. Optical emission spectra (OES) for Cu and Ti neutrals and ions at constant pressure show a linear intensity increase for peak RF powers of 500 W - 3400 W and a steep drop of intensity for a power of 4500 W. Argon neutrals show a linear increase for powers of 500 W - 2300 W and a saturation of intensity between 2300 W - 4500 W. The influence of pressure on the process was studied at a constant peak RF power of 2300 W. With increasing pressure the ionisation degree increased. The microstructure of the coatings shows globular growth at 2.95×10-2 mbar and large-grain columnar growth at 1.2×10-1 mbar. Bottom coverage of unbiased vias with a width of 0.360 μm and aspect ratio of 2.5:1 increased from 15 % to 20 % for this pressure range. The current work has shown that the concept of combining a RF powered coil with a magnet-free high voltage pulsed DC powered cathode is feasible and produces very stable plasma. The experiments have shown a significant influence of power and pressure on the plasma and coating microstructure.

  19. Characterization and modeling of multi-dipolar microwave plasmas: application to multi-dipolar plasma assisted sputtering; Caracterisation et modelisation des plasmas micro-onde multi-dipolaires: application a la pulverisation assistee par plasma multi-dipolaire

    Energy Technology Data Exchange (ETDEWEB)

    Tran, T.V

    2006-12-15

    The scaling up of plasma processes in the low pressure range remains a question to be solved for their rise at the industrial level. One solution is the uniform distribution of elementary plasma sources where the plasma is produced via electron cyclotron resonance (ECR) coupling. These elementary plasma sources are made up of a cylindrical permanent magnet (magnetic dipole) set at the end of a coaxial microwave line. Although of simple concept, the optimisation of these dipolar plasma sources is in fact a complex problem. It requires the knowledge, on one hand, of the configurations of static magnetic fields and microwave electric fields, and, on the other hand, of the mechanisms of plasma production in the region of high intensity magnetic field (ECR condition), and of plasma diffusion. Therefore, the experimental characterisation of the operating ranges and plasma parameters has been performed by Langmuir probes and optical emission spectroscopy on different configurations of dipolar sources. At the same time, in a first analytical approach, calculations have been made on simple magnetic field configurations, motion and trajectory of electrons in these magnetic fields, and the acceleration of electrons by ECR coupling. Then, the results have been used for the validation of the numerical modelling of the electron trajectories by using a hybrid PIC (particle-in-cell) / MC (Monte Carlo) method. The experimental study has evidenced large operating domains, between 15 and 200 W of microwave power, and from 0.5 to 15 mtorr argon pressure. The analysis of plasma parameters has shown that the region of ECR coupling is localised near the equatorial plane of the magnet and dependent on magnet geometry. These characterizations, applied to a cylindrical reactor using 48 sources, have shown that densities between 10{sup 11} and 10{sup 12} cm{sup -3} could be achieved in the central part of the volume at a few mtorr argon pressures. The modelling of electron trajectories near

  20. Sputtering Yield Calculation of Some Candidate PFC Materials

    Institute of Scientific and Technical Information of China (English)

    DENGBaiquan; YANJiancheng; HUANGJinhua

    2001-01-01

    In order to estimate the erosion rates of some plasma facing component materials, the sputtering yields of Mo, W and Li bombarded by charged particles H+, D+, T+ and He+ are calculated by application of sputtering theory based on bipartition model of ion transport. The comparisons with Monte-Carlo calculation results are made. These data might be useful to estimate the lifetime of plasma facing components and to analyze the impurity level in core plasma of fusion reactors.

  1. Simultaneous measurement of electron and heavy particle temperatures in He laser-induced plasma by Thomson and Rayleigh scattering

    Energy Technology Data Exchange (ETDEWEB)

    Dzierzega, K.; Mendys, A.; Zawadzki, W. [Marian Smoluchowski Institute of Physics, Jagiellonian University, ul. Reymonta 4, 30-059 Krakow (Poland); Pokrzywka, B. [Mt. Suhora Observatory, Pedagogical University of Cracow, ul. Podchorazych 2, 30-084 Krakow (Poland); Pellerin, S. [GREMI, site de Bourges, Universite d' Orleans, CNRS, rue Gaston Berger BP 4043, 18028 Bourges (France)

    2013-04-01

    Thomson and Rayleigh scattering methods were applied to quantify the electron and heavy particle temperatures, as well as electron number density, in a laser spark in helium at atmospheric pressure. Plasma was created using 4.5 ns, 25 mJ pulses from Nd:YAG laser at 532 nm. Measurements, performed for the time interval between 20 ns and 800 ns after breakdown, show electron density and temperature to decrease from 7.8 Multiplication-Sign 10{sup 23} m{sup -3} to 2.6 Multiplication-Sign 10{sup 22} m{sup -3} and from 95 900 K to 10 350 K, respectively. At the same time, the heavy particle temperature drops from only 47 000 K down to 4100 K which indicates a two temperature plasma out of local isothermal equilibrium.

  2. Enhancement of osseointegration by direct coating of rhBMP-2 on target-ion induced plasma sputtering treated SLA surface for dental application.

    Science.gov (United States)

    Kim, Sungwon; Park, Cheonil; Moon, Byeong-Seok; Kim, Hyoun-Ee; Jang, Tae-Sik

    2016-11-23

    Owing to the excellent bioactive properties of recombinant human bone morphogenetic proteins (rhBMPs), dentistry considers them as a fascinating adjuvant alternative for enhancing bone regeneration and bone-to-implant junction in the early implantation stages. However, stable loading and delivery efficiency of rhBMPs on the implant surfaces involve major concerns because of the harsh wearing condition under load during implantation. In this study, to achieve successful rhBMP-2 delivery, a nanoporous surface structure is introduced on the sandblasting with large grit and acid-etching (SLA)-treated titanium (Ti) surface via the tantalum (Ta) target-ion induced plasma sputtering (TIPS) technique. Unlike oxidation-induced surface nanoporous fabrications on a Ti surface, TIPS-treated surfaces provide excellent structural unity of the nanoporous structure with the substrate due to their etching-based fabrication mechanism. SLA/TIPS-treated Ti exhibits distinct nanoporous structures on the microscale surface geometry and better hydrophilicity compared with SLA-treated Ti. A sufficiently empty nanoporous surface structure combined with the hydrophilic property of SLA/TIPS-treated Ti facilitates the formation of a thick and uniform coating layer of rhBMP-2 on the surface without any macro- and microcoagulation. Compared with the SLA-treated Ti surface, the amount of coated rhBMP-2 increases up to 63% on the SLA/TIPS-treated Ti surface. As a result, the in vitro pre-osteoblast cell response of the SLA/TIPS-treated Ti surface, especially cell adhesion and differentiation behaviors, improves remarkably. A bone-regenerating direct comparison between the rhBMP-2-coated SLA-treated and SLA/TIPS-treated Ti is conducted on a defective dog mandible model. After 8 weeks of implantation surgery, SLA/TIPS-treated Ti with rhBMP-2 exhibits a better degree of contact area for the implanted bone, which mineralizes new bones around the implant. Quantitative results of bone-in-contact ratio

  3. Solar Wind Sputtering of Lunar Surface Materials: Role and Some Possible Implications of Potential Sputtering

    Science.gov (United States)

    Barghouty, A. F.; Adams, J. H., Jr.; Meyer, F.; Reinhold, c.

    2010-01-01

    Solar-wind induced sputtering of the lunar surface includes, in principle, both kinetic and potential sputtering. The role of the latter mechanism, however, in many focused studies has not been properly ascertained due partly to lack of data but can also be attributed to the assertion that the contribution of solar-wind heavy ions to the total sputtering is quite low due to their low number density compared to solar-wind protons. Limited laboratory measurements show marked enhancements in the sputter yields of slow-moving, highly-charged ions impacting oxides. Lunar surface sputtering yields are important as they affect, e.g., estimates of the compositional changes in the lunar surface, its erosion rate, as well as its contribution to the exosphere as well as estimates of hydrogen and water contents. Since the typical range of solar-wind ions at 1 keV/amu is comparable to the thickness of the amorphous rim found on lunar soil grains, i.e. few 10s nm, lunar simulant samples JSC-1A AGGL are specifically enhanced to have such rims in addition to the other known characteristics of the actual lunar soil particles. However, most, if not all laboratory studies of potential sputtering were carried out in single crystal targets, quite different from the rim s amorphous structure. The effect of this structural difference on the extent of potential sputtering has not, to our knowledge, been investigated to date.

  4. Solar system sputtering

    Science.gov (United States)

    Tombrello, T. A.

    1982-01-01

    The sites and materials involved in solar system sputtering of planetary surfaces are reviewed, together with existing models for the processes of sputtering. Attention is given to the interaction of the solar wind with planetary atmospheres in terms of the role played by the solar wind in affecting the He-4 budget in the Venus atmosphere, and the erosion and differentiation of the Mars atmosphere by solar wind sputtering. The study is extended to the production of isotopic fractionation and anomalies in interplanetary grains by irradiation, and to erosion effects on planetary satellites with frozen volatile surfaces, such as with Io, Europa, and Ganymede. Further measurements are recommended of the molecular form of the ejected material, the yields and energy spectra of the sputtered products, the iosotopic fractionation sputtering causes, and the possibility of electronic sputtering enhancement with materials such as silicates.

  5. Gyrokinetic study of turbulent convection of heavy impurities in tokamak plasmas at comparable ion and electron heat fluxes

    Science.gov (United States)

    Angioni, C.; Bilato, R.; Casson, F. J.; Fable, E.; Mantica, P.; Odstrcil, T.; Valisa, M.; ASDEX Upgrade Team; Contributors, JET

    2017-02-01

    In tokamaks, the role of turbulent transport of heavy impurities, relative to that of neoclassical transport, increases with increasing size of the plasma, as clarified by means of general scalings, which use the ITER standard scenario parameters as reference, and by actual results from a selection of discharges from ASDEX Upgrade and JET. This motivates the theoretical investigation of the properties of the turbulent convection of heavy impurities by nonlinear gyrokinetic simulations in the experimentally relevant conditions of comparable ion and electron heat fluxes. These conditions also correspond to an intermediate regime between dominant ion temperature gradient turbulence and trapped electron mode turbulence. At moderate plasma toroidal rotation, the turbulent convection of heavy impurities, computed with nonlinear gyrokinetic simulations, is found to be directed outward, in contrast to that obtained by quasi-linear calculations based on the most unstable linear mode, which is directed inward. In this mixed turbulence regime, with comparable electron and ion heat fluxes, the nonlinear results of the impurity transport can be explained by the coexistence of both ion temperature gradient and trapped electron modes in the turbulent state, both contributing to the turbulent convection and diffusion of the impurity. The impact of toroidal rotation on the turbulent convection is also clarified.

  6. Reactive sputter deposition

    CERN Document Server

    Mahieu, Stijn

    2008-01-01

    In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

  7. Comparison of induced damage, range, reflection, and sputtering yield between amorphous, bcc crystalline, and bubble-containing tungsten materials under hydrogen isotope and noble gas plasma irradiations

    Science.gov (United States)

    Saito, Seiki; Nakamura, Hiroaki; Tokitani, Masayuki

    2017-01-01

    Binary-collision-approximation simulation of hydrogen isotope (i.e., hydrogen, deuterium, and tritium) and noble gas (i.e., helium, neon, and argon) injections into tungsten materials is performed. Three tungsten structures (i.e., amorphous, bcc crystalline, and helium bubble-containing structures) are prepared as target materials. Then, the trajectories of incident atoms, the distribution of recoil atoms, the penetration depth range of incident atoms, the sputtering yield, and the reflection rate are carefully investigated for these target materials.

  8. Denton Vacuum Discovery-550 Sputterer

    Data.gov (United States)

    Federal Laboratory Consortium — Description: CORAL Name: Sputter 2 Similar to the existing 4-Gun Denton Discovery 22 Sputter system, with the following enhancements: Specifications / Capabilities:...

  9. Influence of shear viscosity of quark-gluon plasma on elliptic flow in ultrarelativistic heavy-ion collisions.

    Science.gov (United States)

    Niemi, H; Denicol, G S; Huovinen, P; Molnár, E; Rischke, D H

    2011-05-27

    We investigate the influence of a temperature-dependent shear viscosity over entropy density ratio η/s on the transverse momentum spectra and elliptic flow of hadrons in ultrarelativistic heavy-ion collisions. We find that the elliptic flow in √S(NN)=200  GeV Au+Au collisions at RHIC is dominated by the viscosity in the hadronic phase and in the phase transition region, but largely insensitive to the viscosity of the quark-gluon plasma (QGP). At the highest LHC energy, the elliptic flow becomes sensitive to the QGP viscosity and insensitive to the hadronic viscosity.

  10. Effective Field Theories for heavy probes in a hot QCD plasma and in the early universe

    Directory of Open Access Journals (Sweden)

    Escobedo Miguel A.

    2017-01-01

    Full Text Available There are many interesting problems in heavy-ion collisions and in cosmology that involve the interaction of a heavy particle with a medium. An example is the dissociation of heavy quarkonium seen in heavy-ion collisions. This was believed to be due to the screening of chromoelectric fields that prevents the heavy quarks from binding, however in the last years several perturbative and lattice computations have pointed out to the possibility that dissociation is due to the finite lifetime of a quarkonium state inside the medium. Regarding cosmology, the study of the behavior of heavy Majorana neutrinos in a hot medium is important to understand if this model can explain the origin of dark matter and the baryon asymmetry. A very convenient way of studying these problems is with the use of non-relativistic effective field theories (EFTs, this allows to make the computations in a more systematic way by defining a more suitable power counting and making it more difficult to miss necessary resummations. In this proceedings I will review the most important results obtained by applying the EFT formalism to the study of quarkonium suppression and Majorana neutrinos, I will also discuss how combining an EFT called potential non-relativistic QCD (pNRQCD with concepts coming from the field of open quantum systems it is possible to understand how the population of the different quarkonium states evolve with time inside a thermal medium.

  11. Sputtering of water ice

    DEFF Research Database (Denmark)

    Baragiola, R.A.; Vidal, R.A.; Svendsen, W.

    2003-01-01

    We present results of a range of experiments of sputtering of water ice together with a guide to the literature. We studied how sputtering depends on the projectile energy and fluence, ice growth temperature, irradiation temperature and external electric fields. We observed luminescence from...

  12. Radial profile measurements of plasma pressure-like fluctuations with the heavy ion beam diagnostic on the tokamak ISTTOK

    Energy Technology Data Exchange (ETDEWEB)

    Henriques, R. B., E-mail: rhenriques@ipfn.ist.utl.pt; Malaquias, A.; Nedzelskiy, I. S.; Silva, C.; Coelho, R.; Figueiredo, H.; Fernandes, H. [Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, 1049-001 Lisboa (Portugal)

    2014-11-15

    The Heavy Ion Beam Diagnostic (HIBD) on the tokamak ISTTOK (Instituto Superior Técnico TOKamak) has been modified, in terms of signal conditioning, to measure the local fluctuations of the n{sub e}σ{sub 1,2}(T{sub e}) product (plasma density times the effective ionization cross-section) along the tokamak minor diameter, in 12 sample volumes in the range of −0.7a < r < 0.7a, with a maximum delay time of 1 μs. The corresponding signals show high correlation with the magnetic Mirnov coils in the characteristic MHD frequency range of ISTTOK plasmas and enable the identification of tearing modes. This paper describes the HIBD signal conditioning system and presents a preliminary analysis of the radial profile measurements of local n{sub e}σ{sub 1,2}(T{sub e}) fluctuations.

  13. Ferroelectric plasma sources for NDCX-II and heavy ion drivers

    Energy Technology Data Exchange (ETDEWEB)

    Gilson, E.P., E-mail: egilson@pppl.gov [Princeton Plasma Physics Laboratory, Princeton University, P.O. Box 451, Princeton, New Jersey, 08543 (United States); Davidson, R.C.; Efthimion, P.C.; Kaganovich, I.D. [Princeton Plasma Physics Laboratory, Princeton University, P.O. Box 451, Princeton, New Jersey, 08543 (United States); Kwan, J.W.; Lidia, S.M.; Ni, P.A.; Roy, P.K.; Seidl, P.A.; Waldron, W.L. [Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, California, 94720 (United States); Barnard, J.J.; Friedman, A. [Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, California, 94550 (United States)

    2014-01-01

    A barium titanate ferroelectric cylindrical plasma source has been developed, tested and delivered for the Neutralized Drift Compression Experiment NDCX-II at Lawrence Berkeley National Laboratory (LBNL). The plasma source design is based on the successful design of the NDCX-I plasma source. A 7 kV pulse applied across the 3.8 mm-thick ceramic cylinder wall produces a large polarization surface charge density that leads to breakdown and plasma formation. The plasma that fills the NDCX-II drift section upstream of the final-focusing solenoid has a plasma number density exceeding 10{sup 10} cm{sup −3} and an electron temperature of several eV. The operating principle of the ferroelectric plasma source are reviewed and a detailed description of the installation plans is presented. The criteria for plasma sources with larger number density will be given, and concepts will be presented for plasma sources for driver applications. Plasma sources for drivers will need to be highly reliable, and operate at several Hz for millions of shots.

  14. Ferroelectric plasma sources for NDCX-II and heavy ion drivers

    Science.gov (United States)

    Gilson, E. P.; Davidson, R. C.; Efthimion, P. C.; Kaganovich, I. D.; Kwan, J. W.; Lidia, S. M.; Ni, P. A.; Roy, P. K.; Seidl, P. A.; Waldron, W. L.; Barnard, J. J.; Friedman, A.

    2014-01-01

    A barium titanate ferroelectric cylindrical plasma source has been developed, tested and delivered for the Neutralized Drift Compression Experiment NDCX-II at Lawrence Berkeley National Laboratory (LBNL). The plasma source design is based on the successful design of the NDCX-I plasma source. A 7 kV pulse applied across the 3.8 mm-thick ceramic cylinder wall produces a large polarization surface charge density that leads to breakdown and plasma formation. The plasma that fills the NDCX-II drift section upstream of the final-focusing solenoid has a plasma number density exceeding 1010 cm-3 and an electron temperature of several eV. The operating principle of the ferroelectric plasma source are reviewed and a detailed description of the installation plans is presented. The criteria for plasma sources with larger number density will be given, and concepts will be presented for plasma sources for driver applications. Plasma sources for drivers will need to be highly reliable, and operate at several Hz for millions of shots.

  15. Photonometers for coating and sputtering machines

    Directory of Open Access Journals (Sweden)

    Václavík J.

    2013-05-01

    Full Text Available The concept of photonometers (alternative name of optical monitor of a vacuum deposition process for coating and sputtering machines is based on photonometers produced by companies like SATIS or HV Dresden. Photometers were developed in the TOPTEC centre and its predecessor VOD (Optical Development Workshop of Institut of Plasma Physics AS CR for more than 10 years. The article describes current status of the technology and ideas which will be incorporated in next development steps. Hardware and software used on coating machines B63D, VNA600 and sputtering machine UPM810 is presented.

  16. Sputtering of dimers off a silicon surface

    Energy Technology Data Exchange (ETDEWEB)

    Nietiadi, Maureen L. [Physics Department, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Research Center OPTIMAS, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Rosandi, Yudi [Physics Department, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Research Center OPTIMAS, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Department of Physics, Universitas Padjadjaran, Jatinangor, Sumedang 45363 (Indonesia); Kopnarski, Michael [Physics Department, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Research Center OPTIMAS, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Institut fuer Oberflaechen- und Schichtanalytik IFOS GmbH, Trippstadter Strasse 120, D-67663 Kaiserslautern (Germany); Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.de [Physics Department, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Research Center OPTIMAS, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany)

    2012-10-15

    We present experimental and molecular-dynamics simulation results of the sputtering of a Si surface by 2 keV Ar ions. Results on both the monomer and dimer distributions are presented. In simulation, these distributions follow a generalized Thompson law with power exponent n=2 and n=3, respectively. The experimental data, obtained via plasma post-ionization in an SNMS (secondary neutral mass spectrometry) apparatus, show good agreement with respect to the dimer fraction, and the relative energy distributions of dimers and monomers. The consequences for the dimer sputtering mechanism are discussed.

  17. Electromagnetic response of quark–gluon plasma in heavy-ion collisions

    Directory of Open Access Journals (Sweden)

    B.G. Zakharov

    2014-10-01

    Full Text Available We study the electromagnetic response of the quark–gluon plasma in AA-collisions at RHIC and LHC energies for a realistic space–time evolution of the plasma fireball. We demonstrate that for a realistic electric conductivity the electromagnetic response of the plasma is in a quantum regime when the induced electric current does not generate a classical electromagnetic field, and can only lead to a rare emission of single photons.

  18. Coulomb-driven energy boost of heavy ions for laser-plasma acceleration.

    Science.gov (United States)

    Braenzel, J; Andreev, A A; Platonov, K; Klingsporn, M; Ehrentraut, L; Sandner, W; Schnürer, M

    2015-03-27

    An unprecedented increase of kinetic energy of laser accelerated heavy ions is demonstrated. Ultrathin gold foils have been irradiated by an ultrashort laser pulse at a peak intensity of 8×10^{19}  W/  cm^{2}. Highly charged gold ions with kinetic energies up to >200  MeV and a bandwidth limited energy distribution have been reached by using 1.3 J laser energy on target. 1D and 2D particle in cell simulations show how a spatial dependence on the ion's ionization leads to an enhancement of the accelerating electrical field. Our theoretical model considers a spatial distribution of the ionization inside the thin target, leading to a field enhancement for the heavy ions by Coulomb explosion. It is capable of explaining the energy boost of highly charged ions, enabling a higher efficiency for the laser-driven heavy ion acceleration.

  19. Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO{sub 2} thin films during growth at low temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Macias-Montero, M.; Garcia-Garcia, F. J.; Alvarez, R.; Gil-Rostra, J.; Gonzalez, J. C.; Gonzalez-Elipe, A. R.; Palmero, A. [Instituto de Ciencia de Materiales de Sevilla (CSIC-US), Americo Vespucio 49, 41092 Seville (Spain); Cotrino, J. [Instituto de Ciencia de Materiales de Sevilla (CSIC-US), Americo Vespucio 49, 41092 Seville (Spain); Departamento de Fisica Atomica, Molecular y Nuclear, Universidad de Sevilla, Avda. Reina Mercedes, s/n, 42022 Seville (Spain)

    2012-03-01

    Growth of amorphous SiO{sub 2} thin films deposited by reactive magnetron sputtering at low temperatures has been studied under different oxygen partial pressure conditions. Film microstructures varied from coalescent vertical column-like to homogeneous compact microstructures, possessing all similar refractive indexes. A discussion on the process responsible for the different microstructures is carried out focusing on the influence of (i) the surface shadowing mechanism, (ii) the positive ion impingement on the film, and (iii) the negative ion impingement. We conclude that only the trend followed by the latter and, in particular, the impingement of O{sup -} ions with kinetic energies between 20 and 200 eV, agrees with the resulting microstructural changes. Overall, it is also demonstrated that there are two main microstructuring regimes in the growth of amorphous SiO{sub 2} thin films by magnetron sputtering at low temperatures, controlled by the amount of O{sub 2} in the deposition reactor, which stem from the competition between surface shadowing and ion-induced adatom surface mobility.

  20. Discharge Physics of High Power Impulse Magnetron Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2010-10-13

    High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading to plasma conditions that make ionization of the sputtered atoms very likely. A brief review of HIPIMS operation is given in a tutorial manner, illustrated by some original data related to the self-sputtering of niobium in argon and krypton. Emphasis is put on the current-voltage-time relationships near the threshold of self-sputtering runaway. The great variety of current pulse shapes delivers clues on the very strong gas rarefaction, self-sputtering runaway conditions, and the stopping of runaway due to the evolution of atom ionization and ion return probabilities as the gas plasma is replaced by metal plasma. The discussions are completed by considering instabilities and the special case of ?gasless? self-sputtering.

  1. Heavy flavours production in quark-gluon plasma formed in high energy nuclear reactions

    Science.gov (United States)

    Kloskinski, J.

    1985-01-01

    Results on compression and temperatures of nuclear fireballs and on relative yield of strange and charmed hadrons are given . The results show that temperatures above 300 MeV and large compressions are unlikely achieved in average heavy ion collision. In consequence, thermal production of charm is low. Strange particle production is, however, substantial and indicates clear temperature - threshold behavior.

  2. Energy deposition of heavy ions in the regime of strong beam-plasma correlations.

    Science.gov (United States)

    Gericke, D O; Schlanges, M

    2003-03-01

    The energy loss of highly charged ions in dense plasmas is investigated. The applied model includes strong beam-plasma correlation via a quantum T-matrix treatment of the cross sections. Dynamic screening effects are modeled by using a Debye-like potential with a velocity dependent screening length that guarantees the known low and high beam velocity limits. It is shown that this phenomenological model is in good agreement with simulation data up to very high beam-plasma coupling. An analysis of the stopping process shows considerably longer ranges and a less localized energy deposition if strong coupling is treated properly.

  3. Dynamic Monte Carlo simulation for reactive sputtering of aluminium

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Z.Y. E-mail: chen@uia.ua.ac.be; Bogaerts, A.; Depla, D.; Ignatova, V

    2003-08-01

    We have applied TRIDYN to simulate the transition from the metallic sputtering to the reactive sputtering mode during magnetron sputtering for an Al target when oxygen is added to argon plasma. Changes in the thickness and composition of multicomponent targets are investigated. The results basically confirm the reactive ion implantation mechanism together with chemical reaction in the subsurface. When oxygen mole fraction x<0.14, the target surface never becomes fully oxidized, even for very long sputtering times. When x>0.14 the target surface can be more or less fully oxidized. Furthermore, an abrupt change in the surface erosion rate at x=0.03 is observed. This corresponds to the avalanche phenomenon indicating the sputtering mode transition.

  4. Fundamental sputtering studies: Nonresonant ionization of sputtered neutrals

    Energy Technology Data Exchange (ETDEWEB)

    Burnett, J.W.; Pellin, M.J.; Calaway, W.F.; Gruen, D.M. (Argonne National Lab., IL (United States)); Yates, J.T. Jr. (Pittsburgh Univ., PA (United States). Dept. of Chemistry)

    1989-01-04

    Because of the practical importance of sputtering, numerous theories and computer simulations are used for predicting many aspects of the sputtering process. Unfortunately, many of the calculated sputtering results are untested by experiment. Until recently, most sputtering experiments required either very high ion fluences or the detection of only minor constituents of the sputtered flux, i.e., ions. These techniques may miss the subtleties involved in the sputtering process. High-detection-efficiency mass spectrometry, coupled with the laser ionization of neutral atoms, allows the detection of the major sputtered species with very low incident ion fluences. The depth-of-origin of sputtered atoms is one example of an important but poorly understood aspect of the sputtering process. By following the sputtering yield of a substrate atom with various coverages of an adsorbed overlayer, the depth of origin of sputtered atoms has been determined. Our results indicate that two-thirds of the sputtered flux originates in the topmost atomic layer. The ion-dose dependence of sputtering yields has long been assumed to be quite minor for low- to-moderate primary ion fluences. We have observed a two-fold decrease in the sputtering yield of the Ru(0001) surface for very low primary ion fluences. Data analysis results in a cross section for damage of 2.7 {plus minus} 1.0 {times} 10{sup {minus}15}cm{sup 2}. 40 refs., 3 figs., 2 tabs.

  5. Coulomb driven energy boost of heavy ions for laser plasma acceleration

    CERN Document Server

    Braenzel, J; Platonov, K; Klingsporn, M; Ehrentraut, L; Sandner, W; Schnürer, M

    2014-01-01

    An unprecedented increase of kinetic energy of laser accelerated heavy ions is demonstrated. Ultra thin gold foils have been irradiated by an ultra short laser pulse at an intensity of $6\\times 10^{19}$ W/cm$^{2}$. Highly charged gold ions with kinetic energies up to $> 200$ MeV and a bandwidth limited energy distribution have been reached by using $1.3$ Joule laser energy on target. $1$D and $2$D Particle in Cell simulations show how a spatial dependence on the ions ionization leads to an enhancement of the accelerating electrical field. Our theoretical model considers a varying charge density along the target normal and is capable of explaining the energy boost of highly charged ions, leading to a higher efficiency in laser acceleration of heavy ions.

  6. Design of a Plasma Emission Monitoring System Used in a Reactive Sputtering Coating%反应溅射镀膜的等离子体发射控制系统设计

    Institute of Scientific and Technical Information of China (English)

    肖劲宇; 和军平

    2011-01-01

    A Plasma Emission Monitoring (PEM) control system based on Allen -Bradley PLC Controller is designed by means of PID algorithm in this paper. Sputter coating principle is introduced firstly and its disanvantage is analyzed too. Then a PEM control technology is proposed to improve sputter coating performance. Besides discussing the sensor, actuator and controller. PID control program in PLC is introduced. A prototype is built up and it works normally. In the end, several process related elements that affect the accuracy, the stability of PEM control loop are also mentioned.%介绍了一种基于Allen- Bradley可编程控制器的等离子体发射监控闭环控制系统;在介绍溅射镀膜工作原理的基础上,分析了影响镀膜性能的多个因素,提出了等离子体发射监控反应溅射镀膜的控制方案;进而,具体介绍了等离子体发射监控系统的传感器、执行器的结构与设计,并进行了PLC- PID控制软件的编程,实现了快速、稳定的控制功能,使反应溅射镀膜工作均匀;实际运行证明了本等离子发射监控设计合理性,可制备氮化钛、氧化钛化合物薄膜,具有良好的推广价值.

  7. RF Sputtering for preparing substantially pure amorphous silicon monohydride

    Science.gov (United States)

    Jeffrey, Frank R.; Shanks, Howard R.

    1982-10-12

    A process for controlling the dihydride and monohydride bond densities in hydrogenated amorphous silicon produced by reactive rf sputtering of an amorphous silicon target. There is provided a chamber with an amorphous silicon target and a substrate therein with the substrate and the target positioned such that when rf power is applied to the target the substrate is in contact with the sputtering plasma produced thereby. Hydrogen and argon are fed to the chamber and the pressure is reduced in the chamber to a value sufficient to maintain a sputtering plasma therein, and then rf power is applied to the silicon target to provide a power density in the range of from about 7 watts per square inch to about 22 watts per square inch to sputter an amorphous silicon hydride onto the substrate, the dihydride bond density decreasing with an increase in the rf power density. Substantially pure monohydride films may be produced.

  8. LCODE: A parallel quasistatic code for computationally heavy problems of plasma wakefield acceleration

    Energy Technology Data Exchange (ETDEWEB)

    Sosedkin, A.P.; Lotov, K.V. [Budker Institute of Nuclear Physics SB RAS, 630090 Novosibirsk (Russian Federation); Novosibirsk State University, 630090 Novosibirsk (Russian Federation)

    2016-09-01

    LCODE is a freely distributed quasistatic 2D3V code for simulating plasma wakefield acceleration, mainly specialized at resource-efficient studies of long-term propagation of ultrarelativistic particle beams in plasmas. The beam is modeled with fully relativistic macro-particles in a simulation window copropagating with the light velocity; the plasma can be simulated with either kinetic or fluid model. Several techniques are used to obtain exceptional numerical stability and precision while maintaining high resource efficiency, enabling LCODE to simulate the evolution of long particle beams over long propagation distances even on a laptop. A recent upgrade enabled LCODE to perform the calculations in parallel. A pipeline of several LCODE processes communicating via MPI (Message‐Passing Interface) is capable of executing multiple consecutive time steps of the simulation in a single pass. This approach can speed up the calculations by hundreds of times.

  9. LCODE: A parallel quasistatic code for computationally heavy problems of plasma wakefield acceleration

    Science.gov (United States)

    Sosedkin, A. P.; Lotov, K. V.

    2016-09-01

    LCODE is a freely distributed quasistatic 2D3V code for simulating plasma wakefield acceleration, mainly specialized at resource-efficient studies of long-term propagation of ultrarelativistic particle beams in plasmas. The beam is modeled with fully relativistic macro-particles in a simulation window copropagating with the light velocity; the plasma can be simulated with either kinetic or fluid model. Several techniques are used to obtain exceptional numerical stability and precision while maintaining high resource efficiency, enabling LCODE to simulate the evolution of long particle beams over long propagation distances even on a laptop. A recent upgrade enabled LCODE to perform the calculations in parallel. A pipeline of several LCODE processes communicating via MPI (Message-Passing Interface) is capable of executing multiple consecutive time steps of the simulation in a single pass. This approach can speed up the calculations by hundreds of times.

  10. LCODE: a parallel quasistatic code for computationally heavy problems of plasma wakefield acceleration

    CERN Document Server

    Sosedkin, Alexander

    2015-01-01

    LCODE is a freely-distributed quasistatic 2D3V code for simulating plasma wakefield acceleration, mainly specialized at resource-efficient studies of long-term propagation of ultrarelativistic particle beams in plasmas. The beam is modeled with fully relativistic macro-particles in a simulation window copropagating with the light velocity; the plasma can be simulated with either kinetic or fluid model. Several techniques are used to obtain exceptional numerical stability and precision while maintaining high resource efficiency, enabling LCODE to simulate the evolution of long particle beams over long propagation distances even on a laptop. A recent upgrade enabled LCODE to perform the calculations in parallel. A pipeline of several LCODE processes communicating via MPI (Message-Passing Interface) is capable of executing multiple consecutive time steps of the simulation in a single pass. This approach can speed up the calculations by hundreds of times.

  11. A new scheme of causal viscous hydrodynamics for relativistic heavy-ion collisions: Riemann solver for quark-gluon plasma

    CERN Document Server

    Akamatsu, Yukinao; Nonaka, Chiho; Takamoto, Makoto

    2013-01-01

    In this article, we present a state-of-the-art algorithm for solving the relativistic viscous hydrodynamic equation with QCD equation of state. The numerical method is based on the second-order Godunov method and has less numerical dissipation, which are crucial in describing of quark-gluon plasma in high energy heavy-ion collisions. We apply the algorithm to several numerical test problems such as sound wave propagation, shock tube and blast wave problems. In the sound wave propagation, the intrinsic {\\em numerical} viscosity is measured and its explicit expression is shown, which is the second-order of spatial resolution both in the presence and absence of {\\em physical} viscosity. The expression of the numerical viscosity can be used to determine the maximum cell size in order to accurately measure the effect of physical viscosity in the numerical simulation.

  12. Assessment of Atmospheric heavy metal deposition in North Egypt aerosols using neutron activation analysis and optical emission inductively coupled plasma

    Energy Technology Data Exchange (ETDEWEB)

    El-Araby, E.H., E-mail: elaraby_20032000@yahoo.com [Faculty of Science, Physics Department, Jezan University, KSA (Saudi Arabia); Abd El-Wahab, M., E-mail: wahab_magda@yahoo.com [Faculty of women for Arts, Science and Education, Physics Department, Ain Shams University, PO11757 Cairo (Egypt); Diab, H.M., E-mail: hnndiab@yahoo.co.uk [National Center of Nuclear Safety and Radiation Control, Atomic Energy Authority Cairo (Egypt); El-Desouky, T.M., E-mail: trkhegazy@yahoo.com [Faculty of women for Arts, Science and Education, Physics Department, Ain Shams University, PO11757 Cairo (Egypt); Mohsen, M., E-mail: m1mohsen@yahoo.com [Faculty of Science. Physics Department, Ain-Shams University, PO 11566 Cairo (Egypt)

    2011-10-15

    The aim of the present study is to assess the current level of atmospheric heavy metal pollution of aerosols in different cities of North Egypt using the neutron activation analysis and optical emission inductively coupled plasma techniques. The results revealed that the highest concentrations of particulate matter PM{sub 10} and total suspended particulate matter were close to industrial areas. From the results of the enrichment factor calculations, the most significant elements of anthropogenic origin are Ba, Sb, Ce and Zn. - Highlights: > Average concentration of Cd using OE-ICP is below detection limit for all the samples. > Maximum average concentration of Pb in PM10 and TSP is 5425 and 570.3, respectively. > Concentration of 20 elements in PM{sub 10} and TSP aerosols are determined using the NAA. > EF revealed that Pb, Ba, Br, Ce, Hf, La Sb and Zn are of anthropogenic origin.

  13. The influence of transition and heavy metal ions on ATP-ases activity in rat synaptic plasma membranes

    Directory of Open Access Journals (Sweden)

    VESNA VASIC

    2004-07-01

    Full Text Available The influence of transition metal (Cu2+, Zn2+, Fe2+ and Co2+ and heavy metal ions (Hg2+, Pb2+ and Cd2+ on the activities of Na+/K+-ATPase and Mg2+-ATPase isolated from rat synaptic plasma membranes (SPM was investigated. The aim of the study was to elucidate the inhibition of both ATPase activities by exposure to the considered metal ions as a function of their affinity to bind to the –SH containing ligand L-cysteine, as a model system. The half-maximum inhibitory activities (IC50 of the enzymes were determined as parameters of rectangular hyperbolas and correlated with the stability constant (Ks of the respective metal-ion-L-cysteine complex. The linear Dixon plots indicate equilibrium binding of the investigated ions to both enzymes.

  14. EBIT spectroscopy of highly charged heavy ions relevant to hot plasmas

    Science.gov (United States)

    Nakamura, Nobuyuki

    2013-05-01

    An electron beam ion trap (EBIT) is a versatile device for studying highly charged ions. We have been using two types of EBITs for the spectroscopic studies of highly charged ions. One is a high-energy device called the Tokyo-EBIT, and another is a compact low-energy device called CoBIT. Complementary use of them enables us to obtain spectroscopic data for ions over a wide charge-state range interacting with electrons over a wide energy range. In this talk, we present EBIT spectra of highly charged ions for tungsten, iron, bismuth, etc., which are relevant to hot plasmas. Tungsten is considered to be the main impurity in the ITER (the next generation nuclear fusion reactor) plasma, and thus its emission lines are important for diagnosing and controlling the ITER plasma. We have observed many previously unreported lines to supply the lack of spectroscopic data of tungsten ions. Iron is one of the main components of the solar corona, and its spectra are used to diagnose temperature, density, etc. The diagnostics is usually done by comparing observed spectra with model calculations. An EBIT can provide spectra under a well-defined condition; they are thus useful to test the model calculations. Laser-produced bismuth plasma is one of the candidates for a soft x-ray source in the water window region. An EBIT has a narrow charge state distribution; it is thus useful to disentangle the spectra of laser-produced plasma containing ions with a wide charge-state range. Performed with the support and under the auspices of the NIFS Collaboration Research program (NIFS09KOAJ003) and JSPS KAKENHI Number 23246165, and partly supported by the JSPS-NRF-NSFC A3 Foresight Program in the field of Plasma Physics.

  15. Origin of Temperature of Quark-Gluon Plasma in Heavy Ion Collisions

    CERN Document Server

    Xu, Xiao-Ming

    2015-01-01

    Initially produced quark-gluon matter at RHIC and LHC does not have a temperature. A quark-gluon plasma has a high temperature. From this quark-gluon matter to the quark-gluon plasma is the early thermalization or the rapid creation of temperature. Elastic three-parton scattering plays a key role in the process. The temperature originates from the two-parton scattering, the three-parton scattering, the four-parton scattering and so forth in quark-gluon matter.

  16. Near Zone Navier-Stokes Analysis of Heavy Quark Jet Quenching in an $\\mathcal{N}$ =4 SYM Plasma

    CERN Document Server

    Noronha, Jorge; Gyulassy, Miklos

    2007-01-01

    The near zone energy-momentum tensor of a supersonic heavy quark jet moving through a strongly-coupled $\\mathcal{N}=4$ SYM plasma is analyzed in terms of nonlinear Navier-Stokes hydrodynamics. We show that local isotropic equilibrium in the Landau frame holds to within 20% accuracy down to a length scale $\\sim 1/\\pi T$, much smaller than found previously from far zone analysis. For distances less than this scale, the AdS solution rapidly becomes non-isotropic and local equilibrium breaks down. The component of the dissipative stress also remain small compared to the advective (non-viscous) fluid stress down to distances $\\sim 1/\\pi T$ from the heavy quark jet. Our result, which is compatible with the thermalization timescales extracted from elliptic flow measurements, suggests that if AdS/CFT provides a good description of the RHIC system, the bulk of the quenched jet energy has more than enough time to locally thermalize and become encoded in the collective flow. The resulting flow pattern close to the quark...

  17. New Description Model of Sputtering on Material Surface

    Institute of Scientific and Technical Information of China (English)

    邓柏权; 严建成; 黄锦华; 彭利林

    2003-01-01

    In order to estimate the erosion rates of some plasma facing component materials, the sputtering yields of Mo, W and deuterium-saturated Li bombarded by fusion charged particles are calculated by application of new sputtering physics description methods based on the bipartition model of ion transport theory. The comparisons with Monte Carlo calculation and experimental results are made. These data might be useful to estimate the lifetime of plasma facing components and to analyse the impurity level in core plasma of fusion reactors.

  18. Coupled core-SOL modelling of W contamination in H-mode JET plasmas with ITER-like wall

    Energy Technology Data Exchange (ETDEWEB)

    Parail, V., E-mail: Vassili.parail@ccfe.ac.uk [CCFE Culham Science Centre, Abingdon, Oxon OX14 3DB (United Kingdom); Corrigan, G.; Da Silva Aresta Belo, P. [CCFE Culham Science Centre, Abingdon, Oxon OX14 3DB (United Kingdom); De La Luna, E. [Laboratorio Nacional de Fusion, Madrid (Spain); Harting, D. [CCFE Culham Science Centre, Abingdon, Oxon OX14 3DB (United Kingdom); Koechl, F. [Atominstitut, TU Wien, 1020 Vienna (Austria); Koskela, T. [Aalto University, Department of Applied Physics, P.O. Box 14100, FIN-00076 Aalto (Finland); Meigs, A.; Militello-Asp, E.; Romanelli, M. [CCFE Culham Science Centre, Abingdon, Oxon OX14 3DB (United Kingdom); Tsalas, M. [FOM Institute DIFFER, P.O. Box 1207, NL-3430 BE Nieuwegein (Netherlands)

    2015-08-15

    The influence of the ITER-like Wall (ILW) with divertor target plate made of tungsten (W), on plasma performance in JET H-mode is being investigated since 2011 (see F. Romanelli and references therein). One of the key issues in discharges with low level of D fuelling is observed accumulation of W in the plasma core, which leads to a reduction in plasma performance. To study the interplay between W sputtering on the target plate, penetration of W through the SOL and edge transport barrier (ETB) and its further accumulation in plasma core predictive modelling was launched using a coupled 1.5D core and 2D SOL code JINTRAC (Romanelli, 2014; Cenacchi and Taroni, 1988; Taroni et al., 1992; Wiesen et al., 2006). Simulations reveal the important role of ELMs in W sputtering and plasma density control. Analyses also confirm pivotal role played by the neo-classical pinch of heavy impurities within the ETB.

  19. The dynamic changes of the plasma membrane proteins and the protective roles of nitric oxide in rice subjected to heavy metal cadmium stress

    Science.gov (United States)

    The heavy metal cadmium is a common environmental contaminant in soils and has adverse effects on crop growth and development. The signaling processes in plants that initiate cellular responses to environmental stress have been shown to be located in the plasma membrane (PM). A better understanding ...

  20. Surface treatment of diamond-like carbon films by reactive Ar/CF{sub 4} high-power pulsed magnetron sputtering plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Kimura, Takashi, E-mail: t-kimura@nitech.ac.jp [Graduate School of Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555 (Japan); Nishimura, Ryotaro [Graduate School of Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555 (Japan); Azuma, Kingo [Department of Electrical Engineering and Computer Sciences, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2280 (Japan); Nakao, Setsuo; Sonoda, Tsutomu; Kusumori, Takeshi; Ozaki, Kimihiro [National Institute of Advanced Industrial Science and Technology (AIST) - Chubu, 2266-98 Anagahora, Moriyama, Nagoya 463-8560 (Japan)

    2015-12-15

    Surface modification of diamond-like carbon films deposited by a high-power pulsed magnetron sputtering (HPPMS) of Ar was carried out by a HPPMS of Ar/CF{sub 4} mixture, changing a CF{sub 4} fraction from 2.5% to 20%. The hardness of the modified films markedly decreased from about 13 to about 3.5 GPa with increasing CF{sub 4} fraction, whereas the water contact angle of the modified films increased from 68° to 109° owing to the increase in the CF{sub x} content on the film surface. C 1s spectra in X-ray photoelectron spectroscopy indicated that a graphitic structure of modified films was formed at CF{sub 4} fractions less than 5%, above which the modified films possessed a polymer-like structure. Influence of treatment time on the properties of the modified films was also investigated in the range of treatment time from 5 to 30 min. The properties of the modified films did not depend on the treatment time in the range of treatment time longer than 10 min, whereas the water contact angle was not sensitive to the treatment time at any treatment time.

  1. Comparative study of structural and electro-optical properties of ZnO:Ga films grown by steered cathodic arc plasma evaporation and sputtering on plastic and their application on polymer-based organic solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Liang, Chih-Hao, E-mail: dataman888@hotmail.com [R& D Division, Walsin Technology Corporation, Kaohsiung, Taiwan (China); Hsiao, Yu-Jen [National Nano Device Laboratories, National Applied Research Laboratories, Tainan, Taiwan (China); Hwang, Weng-Sing [Department of Materials Science and Engineering, National Cheng Kung University, Tainan, Taiwan (China)

    2016-08-01

    Ga-doped ZnO (GZO) films with various thicknesses (105–490 nm) were deposited on PET substrates at a low temperature of 90 °C by a steered cathodic arc plasma evaporation (steered CAPE), and a GZO film with a thickness of 400 nm was deposited at 90 °C by a magnetron sputtering (MS) for comparison. The comparative analysis of the microstructure, residual stress, surface morphology, electrical and optical properties, chemical states, and doping efficiency of the films produced by the steered CAPE and MS processes was performed, and the effect of thickness on the CAPE-grown GZO films was investigated in detail. The results showed that the GZO films grown by steered CAPE exhibited higher crystallinity and lower internal stress than those deposited by MS. The transmittance and electrical properties were also enhanced for the steered CAPE-grown films. The figure of merit (Φ = T{sup 10}/R{sub s}, where T is the transmittance and R{sub s} is the sheet resistance in Ω/□). was used to evaluate the performance of the electro-optical properties. The GZO films with a thickness of 400 nm deposited by CAPE had the highest Φ value, 1.94 × 10{sup −2} Ω{sup −1}, a corresponding average visible transmittance of 88.8% and resistivity of 6.29 × 10{sup −4} Ω·cm. In contrast, the Φ value of MS-deposited GZO film with a thickness of 400 nm is only 1.1 × 10{sup −3} Ω{sup −1}. This can be attributed to the increase in crystalline size, [0001] preferred orientation, decrease in stacking faults density and Ar contamination in steered CAPE-grown films, leading to increases in the Hall mobility and carrier density. In addition, the power conversion efficiency (PCE) of organic solar cells was significantly improved by using the CAPE-grown GZO electrode, and the PCE values were 1.2% and 1.7% for the devices with MS-grown and CAPE-grown GZO electrodes, respectively. - Highlights: • ZnO:Ga (GZO) films were grown on PET by steered cathodic arc plasma evaporation (CAPE

  2. Compression and strong rarefaction in high power impulse magnetron sputtering discharges

    Energy Technology Data Exchange (ETDEWEB)

    Horwat, David; Anders, Andre

    2010-11-11

    Gas compression and strong rarefaction have been observed for high power impulse magnetron sputtering (HIPIMS) discharges using a copper target in argon. Time-resolved ion saturation currents of 35 probes were simultaneously recorded for HIPIMS discharges operating far above the self-sputtering runaway threshold. The argon background pressure was a parameter for the evaluation of the spatial and temporal development of the plasma density distribution. The data can be interpreted by a massive onset of the sputtering flux (sputter wind) that causes a transient densification of the gas, followed by rarefaction and the replacement of gas plasma by the metal plasma of sustained self-sputtering. The plasma density pulse follows closely the power pulse at low pressure. At high pressure, the relatively remote probes recorded a density peak only after the discharge pulse, indicative for slow, diffusive ion transport.

  3. Design study of electron cyclotron resonance-ion plasma accelerator for heavy ion cancer therapy

    Energy Technology Data Exchange (ETDEWEB)

    Inoue, T., E-mail: ttinoue@juntendo.ac.jp; Sugimoto, S.; Sasai, K. [Graduate School of Medicine, Juntendo University, Tokyo 113–8421 (Japan); Hattori, T. [National Institute of Radiological Sciences, Chiba 263–0024 (Japan)

    2014-02-15

    Electron Cyclotron Resonance-Ion Plasma Accelerator (ECR-IPAC) device, which theoretically can accelerate multiple charged ions to several hundred MeV with short acceleration length, has been proposed. The acceleration mechanism is based on the combination of two physical principles, plasma electron ion adiabatic ejection (PLEIADE) and Gyromagnetic Autoresonance (GYRAC). In this study, we have designed the proof of principle machine ECR-IPAC device and simulated the electromagnetic field distribution generating in the resonance cavity. ECR-IPAC device consisted of three parts, ECR ion source section, GYRAC section, and PLEIADE section. ECR ion source section and PLEIADE section were designed using several multi-turn solenoid coils and sextupole magnets, and GYRAC section was designed using 10 turns coil. The structure of ECR-IPAC device was the cylindrical shape, and the total length was 1024 mm and the maximum diameter was 580 mm. The magnetic field distribution, which maintains the stable acceleration of plasma, was generated on the acceleration center axis throughout three sections. In addition, the electric field for efficient acceleration of electrons was generated in the resonance cavity by supplying microwave of 2.45 GHz.

  4. Relativistically Induced Transparency Acceleration (RITA) of Protons and Light-ions with Ultrashort Laser Interaction with Heavy-ion Plasma Density Gradient

    CERN Document Server

    Sahai, Aakash A; Tableman, A R; Mori, W B; Katsouleas, T C

    2014-01-01

    The relativistically induced transparency acceleration (RITA) scheme of proton and ion acceleration using laser-plasma interactions is introduced, modeled, and compared to the existing schemes. Protons are accelerated with femtosecond relativistic pulses to produce quasimonoenergetic bunches with controllable peak energy. The RITA scheme works by a relativistic laser inducing transparency to densities higher than the cold-electron critical density, while the background heavy ions are stationary. The rising laser pulse creates a traveling acceleration structure at the relativistic critical density by ponderomotively driving a local electron density inflation, creating an electron snowplow and a co-propagating electrostatic potential. The snowplow advances with a velocity determined by the rate of the rise of the laser's intensity envelope and the heavy-ion-plasma density gradient scale length. The rising laser is incrementally rendered transparent to higher densities such that the relativistic-electron plasma ...

  5. Statistical Analysis of EMIC Waves in Multiple Component Plasma Including Heavy Ions

    Science.gov (United States)

    Matsuda, S.; Kasahara, Y.; Goto, Y.

    2013-12-01

    It is well known that Earth's radiation belts are located around geomagnetic equator, where wide ranges of energetic particles from several hundred keV to several tens MeV are contained. According to the recent study, it is suggested that ELF/VLF waves such as EMIC waves and chorus emissions deeply contribute to the generation and loss mechanism of relativistic electrons in the radiation belt. The ERG mission[1] is expected to provide important clues for solving plasma dynamics in the Earth's radiation belts by means of integrated observation of wide energy range of plasma particles and high resolution plasma waves. On the other hand, long-term observation data which covers over 2 cycles of solar activity obtained by the Akebono satellite is very valuable to work out the strategy of the ERG mission. The ELF receiver, which is a sub-system of the VLF instruments onboard Akebono, measures waveforms below 50 Hz for one component of electric field and three components of magnetic field, or waveforms below 100 Hz for one component of electric and magnetic field, respectively. It was reported that ion cyclotron waves were observed near magnetic equator by the receiver[2]. In our previous study[3], we introduced four events of characteristic EMIC waves observed by Akebono in April, 1989. These waves have sudden decrease of intensity just above half of proton cyclotron frequency changing along the trajectories of Akebono. Comparing the observed data with the dispersion relation in multiple species of ions under cold plasma approximation, we demonstrate that a few percent of 'M / Z = 2 ions (M = mass of ions, Z = charge of ions)' such as alpha particles (He++) or deuterons (D+) cause such characteristic attenuation of EMIC at lower hybrid frequency. In the present study, we performed polarization analysis and direction finding of the waves. It was found that these EMIC waves were left-handed polarized in the higher frequency part, while the polarization gradually changes to

  6. Properties of inductively coupled N2 plasma processed AlInN thin film prepared by post annealing of rf sputtered Al/InN stack

    Science.gov (United States)

    Shanmugan, S.; Mutharasu, D.

    2016-12-01

    InN is a potential material for low cost tandem solar cells and its combination with Si could make the cell conversion efficiency over 30%. Doping into InN is a promising method which alters the properties of InN thin film. In this work, InN thin film was deposited on Si substrate and the doping was achieved by stacking Al elemental layer on InN thin film followed by annealing process. The doped InN (AlInN) thin film was characterized and confirmed the formation of (002) and (103) oriented phases. The prepared AlInN thin film was plasma processed using Inductively coupled plasma (ICP) in presence of N2 gas and the surface and structural properties was modified. The N2 plasma was influenced the preferred orientation of AlInN thin film and their structural parameters such as crystallite size, strain and dislocation density noticeably. Very smooth surface (<4 nm) with small particle size (97 nm) of AlInN thin film was achieved for 15 sccm flow rate during the plasma process. Very low value in leakage current was confirmed for AlInN thin film processed at 15 sccm N2 flow by current-voltage (IV) characteristics.

  7. Generation of quasi-monoenergetic heavy ion beams via staged shock wave acceleration driven by intense laser pulses in near-critical plasmas

    Science.gov (United States)

    Zhang, W. L.; Qiao, B.; Shen, X. F.; You, W. Y.; Huang, T. W.; Yan, X. Q.; Wu, S. Z.; Zhou, C. T.; He, X. T.

    2016-09-01

    Laser-driven ion acceleration potentially offers a compact, cost-effective alternative to conventional accelerators for scientific, technological, and health-care applications. A novel scheme for heavy ion acceleration in near-critical plasmas via staged shock waves driven by intense laser pulses is proposed, where, in front of the heavy ion target, a light ion layer is used for launching a high-speed electrostatic shock wave. This shock is enhanced at the interface before it is transmitted into the heavy ion plasmas. Monoenergetic heavy ion beam with much higher energy can be generated by the transmitted shock, comparing to the shock wave acceleration in pure heavy ion target. Two-dimensional particle-in-cell simulations show that quasi-monoenergetic {{{C}}}6+ ion beams with peak energy 168 MeV and considerable particle number 2.1 × {10}11 are obtained by laser pulses at intensity of 1.66 × {10}20 {{W}} {{cm}}-2 in such staged shock wave acceleration scheme. Similarly a high-quality {{Al}}10+ ion beam with a well-defined peak with energy 250 MeV and spread δ E/{E}0=30 % can also be obtained in this scheme.

  8. Effects of heavy metals on the Ca(2+)-ATPase activity present in gill cell plasma-membrane of mussels (Mytilus galloprovincialis Lam.).

    Science.gov (United States)

    Viarengo, A; Mancinelli, G; Pertica, M; Fabbri, R; Orunesu, M

    1993-11-01

    1. Heavy metals (Hg2+, Cu2+, Cd2+, Zn2+, Pb2+) at micromolar concentrations strongly inhibit the Ca(2+)-ATPase activity present in the plasma-membrane obtained from the gill cells of Mytilus galloprovincialis Lam. Heavy metals act through inhibition of the formation of the phosphorylated intermediate. 2. All the heavy metals tested inhibit the Ca(2+)-ATPase activity, the effect following the order: Hg2+ > Pb2+ > Cu2+ > Cd2+ > Zn2+; the simultaneous addition of different heavy metals causes a summatory inhibition of the enzyme activity; addition to the reaction mixture of GSH at a final concentration of 0.5 mM, reverses inhibitory effects of heavy metals. 3. The inhibitory effects of Cu2+ on Ca(2+)-ATPase are highly enhanced by addition of ascorbate to the reaction mixture. In the presence of ascorbate (100 microM), copper strongly stimulates the lipid peroxidation damage of the gill plasma-membranes, a result that may explain the high copper cytotoxicity.

  9. Anion formation in sputter ion sources by neutral resonant ionization

    Energy Technology Data Exchange (ETDEWEB)

    Vogel, J. S., E-mail: johnsvogel@yahoo.com [University of California, 8300 Feliz Creek Dr., Ukiah, California 95482 (United States)

    2016-02-15

    Focused Cs{sup +} beams in sputter ion sources create mm-diameter pits supporting small plasmas that control anionization efficiencies. Sputtering produces overwhelmingly neutral products that the plasma can ionize as in a charge-change vapor. Electron capture between neutral atoms rises as the inverse square of the difference between the ionization potential of the Cs state and the electron affinity of the sputtered atom, allowing resonant ionization at very low energies. A plasma collision-radiation model followed electronic excitation up to Cs(7d). High modeled Cs(7d) in a 0.5 mm recess explains the 80 μA/mm{sup 2} C{sup −} current density compared to the 20 μA/mm{sup 2} from a 1 mm recess.

  10. Three-dimensional particle simulation of back-sputtered carbon in electric propulsion test facility

    Science.gov (United States)

    Zheng, Hongru; Cai, Guobiao; Liu, Lihui; Shang, Shengfei; He, Bijiao

    2017-03-01

    The back-sputtering deposition on thruster surface caused by ion bombardment on chamber wall material affects the performance of thrusters during the ground based electric propulsion endurance tests. In order to decrease the back-sputtering deposition, most of vacuum chambers applied in electric propulsion experiments are equipped with anti-sputtering targets. In this paper, a three-dimensional model of plume experimental system (PES) including double layer anti-sputtering target is established. Simulation cases are made to simulate the plasma environment and sputtering effects when an ion thruster is working. The particle in cell (PIC) method and direct simulation Monte Carlo (DSMC) method is used to calculate the velocity and position of particles. Yamamura's model is used to simulate the sputtering process. The distribution of sputtered anti-sputtering target material is presented. The results show that the double layer anti-sputtering target can significantly reduce the deposition on thruster surface. The back-sputtering deposition rates on thruster exit surface for different cases are compared. The chevrons on the secondary target are rearranged to improve its performance. The position of secondary target has relation with the ion beam divergence angle, and the radius of the vacuum chamber. The back-sputtering deposition rate is lower when the secondary target covers the entire ion beam.

  11. Discharge current modes of high power impulse magnetron sputtering

    Directory of Open Access Journals (Sweden)

    Zhongzhen Wu

    2015-09-01

    Full Text Available Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.

  12. Magnet-free uniform sputtering of dielectric film by RF and microwave power superposition

    Science.gov (United States)

    Sasai, Kensuke; Hagihara, Toshiya; Noda, Tomonori; Suzuki, Haruka; Toyoda, Hirotaka

    2016-08-01

    A novel sputtering device that is free of magnets (magnet-free surface wave sputtering plasma: MF-SSP) is developed by combining a surface wave plasma and RF bias power. Low-pressure (<0.5 Pa) plasma sustainment is demonstrated by MF-SSP with a uniform sputter deposition rate with a deviation of less than 5% within an area of 10 × 10 cm2. Highly oriented MgO films are deposited at a substrate temperature of 200 °C.

  13. Analysis of Mineral and Heavy Metal Content of Some Commercial Fruit Juices by Inductively Coupled Plasma Mass Spectrometry

    Directory of Open Access Journals (Sweden)

    Adriana Dehelean

    2013-01-01

    Full Text Available The presence of potentially toxic elements and compounds in foodstuffs is of intense public interest and thus requires rapid and accurate methods to determine the levels of these contaminants. Inductively coupled plasma mass spectrometry is a powerful tool for the determination of metals and nonmetals in fruit juices. In this study, 21 commercial fruit juices (apple, peach, apricot, orange, kiwi, pear, pineapple, and multifruit present on Romanian market were investigated from the heavy metals and mineral content point of view by ICP-MS. Our obtained results were compared with those reported in literature and also with the maximum admissible limit in drinking water by USEPA and WHO. For Mn the obtained values exceeded the limits imposed by these international organizations. Co, Cu, Zn, As, and Cd concentrations were below the acceptable limit for drinking water for all samples while the concentrations of Ni and Pb exceeded the limits imposed by USEPA and WHO for some fruit juices. The results obtained in this study are comparable to those found in the literature.

  14. Magnetron sputtering system stabilisation for high rate desposition of AlN films

    DEFF Research Database (Denmark)

    Fomin, A; Akhmatov, Vladislav; Selishchev, S

    1998-01-01

    The stabilisation of a planar magnetron sputtering system for reactive sputtering of AlN in a gaseous mixture of Ar and highly active NH3 was examined. The helical instability in the cathode plasma sheath was observed and methods for its damping were proposed. It was found that the deposition of c...

  15. Nonlinear transmission sputtering

    Science.gov (United States)

    Bitensky, I. S.; Sigmund, P.

    1996-05-01

    General expressions have been derived for the nonlinear yield of transmission sputtering for an incident polyatomic ion under the assumption that the molecule breaks up on entering the target and that sputter yields are enhanced due to proximity of atomic trajectories. Special attention is given to the case of negligible Coulomb explosion where projectile atoms penetrate independently. For weakly overlapping trajectories, the yield enhancement factor of a polyatomic molecule can be expressed by that of a diatom, amended with a correction for triple correlations if necessary. This expression is in good agreement with recent experimental findings on phenylalanine targets. Pertinent results on multiple scattering of atomic ions are reviewed and applied to independently-moving fragment atoms. The merits of measurements at variable layer thickness in addition to variable projectile energy are mentioned.

  16. Sputtering of W-Mo alloy under ion bombardment

    Institute of Scientific and Technical Information of China (English)

    1999-01-01

    The distribution of plasma density in the vicinity of the W-Mo alloy source in the process of dou ble-glow discharge plasma surface alloying was diagnosed using the moveable Langmuir probe. The sputtering law, surface composition and morphological variation of the W-Mo alloy source was studied. The experimental results show that there exists obvious preferential sputtering on the surface of the W-Mo alloy source under the argon ion bombardment; the stable period is reached after a transitional period, and the preferential sputtering occurs in a definite range of composition(mole fraction): 70 % ~ 75 % Mo, 22 % ~ 25 % W; there appears segregation on the surface of the W-Mo alloy source.

  17. Kinetic simulation of neutral particle transport in sputtering processes

    Science.gov (United States)

    Trieschmann, Jan; Gallian, Sara; Brinkmann, Ralf Peter; Mussenbrock, Thomas; Ries, Stefan; Bibinov, Nikita; Awakowicz, Peter

    2013-09-01

    For many physical vapor deposition applications using sputtering processes, knowledge about the detailed spatial and temporal evolution of the involved gas species is of great importance. Modeling of the involved gas dynamic and plasma processes is however challenging, because the operating pressure is typically below 1 Pa. In consequence, only kinetic descriptions are appropriate. In order to approach this problem, the dynamics of sputtered particle transport through a neutral gas background is simulated. For this study, a modified version of the three-dimensional Direct Simulation Monte Carlo (DSMC) code dsmcFoam is utilized. The impact of a transient sputtering wind is investigated in a generic reactor geometry, which may be used for dc Magnetron Sputtering (dcMS), High Power Impulse Magnetron Sputtering (HiPIMS), as well as sputtering in capacitively coupled discharges. In the present work a rarefaction of the background gas is observed. Moreover in pulsed mode the temporal dynamics of the rarefaction and subsequent recovery of the background gas is investigated. This work is supported by the German Research Foundation in the frame of TRR 87.

  18. High coercivity, anisotropic, heavy rare earth-free Nd-Fe-B by Flash Spark Plasma Sintering.

    Science.gov (United States)

    Castle, Elinor; Sheridan, Richard; Zhou, Wei; Grasso, Salvatore; Walton, Allan; Reece, Michael J

    2017-09-11

    In the drive to reduce the critical Heavy Rare Earth (HRE) content of magnets for green technologies, HRE-free Nd-Fe-B has become an attractive option. HRE is added to Nd-Fe-B to enhance the high temperature performance of the magnets. To produce similar high temperature properties without HRE, a crystallographically textured nanoscale grain structure is ideal; and this conventionally requires expensive "die upset" processing routes. Here, a Flash Spark Plasma Sintering (FSPS) process has been applied to a Dy-free Nd30.0Fe61.8Co5.8Ga0.6Al0.1B0.9 melt spun powder (MQU-F, neo Magnequench). Rapid sinter-forging of a green compact to near theoretical density was achieved during the 10 s process, and therefore represents a quick and efficient means of producing die-upset Nd-Fe-B material. The microstructure of the FSPS samples was investigated by SEM and TEM imaging, and the observations were used to guide the optimisation of the process. The most optimal sample is compared directly to commercially die-upset forged (MQIII-F) material made from the same MQU-F powder. It is shown that the grain size of the FSPS material is halved in comparison to the MQIII-F material, leading to a 14% increase in coercivity (1438 kA m(-1)) and matched remanence (1.16 T) giving a BHmax of 230 kJ m(-3).

  19. Particle contamination formation and detection in magnetron sputtering processes

    Energy Technology Data Exchange (ETDEWEB)

    Selwyn, G.S. [Los Alamos National Lab., NM (United States); Weiss, C.A. [Materials Research Corp., Congers, NY (United States). Sputtering Systems Div.; Sequeda, F.; Huang, C. [Seagate Peripherals Disk Div., Milpitas, CA (United States)

    1996-10-01

    Defects caused by particulate contamination are an important concern in the fabrication of thin film products. Often, magnetron sputtering processes are used for this purpose. Particle contamination can cause electrical shorting, pin holes, problems with photolithography, adhesion failure, as well as visual and cosmetic defects. Particle contamination generated during thin film processing can be detected using laser light scattering, a powerful diagnostic technique that provides real-time, {ital in-situ} imaging of particles > 0.3 {mu}m in diameter. Using this technique, the causes, sources and influences on particles in plasma and non-plasma and non-plasma processes may be independently evaluated and corrected. Several studies employing laser light scattering have demonstrated both homogeneous and heterogeneous causes of particle contamination. In this paper, we demonstrate that the mechanisms for particle generation, transport and trapping during magnetron sputter deposition are different from the mechanisms reported in previously studied plasma etch processes. During magnetron sputter deposition, one source of particle contamination is linked to portions of the sputtering target surface exposed to weaker plasma density. In this region, film redeposition is followed by filament or nodule growth and enhanced trapping which increases filament growth. Eventually the filaments effectively ``short circuit`` the sheath, causing high currents to flow through these features. This, in turn, causes heating failure of the filament fracturing and ejecting the filaments into the plasma and onto the substrate. Evidence of this effect has been observed in semiconductor (IC) fabrication and storage disk manufacturing. Discovery of this mechanism in both technologies suggests that this mechanism may be universal to many sputtering processes.

  20. RF Reactive Magnetron Sputter Deposition of Silicon Sub-Oxides

    NARCIS (Netherlands)

    Hattum, E.D. van

    2007-01-01

    RF reactive magnetron plasma sputter deposition of silicon sub oxide E.D. van Hattum Department of Physics and Astronomy, Faculty of Sciences, Utrecht University The work described in the thesis has been inspired and stimulated by the use of SiOx layers in the direct inductive printing technology, w

  1. Development of magnetron sputtering simulator with GPU parallel computing

    Science.gov (United States)

    Sohn, Ilyoup; Kim, Jihun; Bae, Junkyeong; Lee, Jinpil

    2014-12-01

    Sputtering devices are widely used in the semiconductor and display panel manufacturing process. Currently, a number of surface treatment applications using magnetron sputtering techniques are being used to improve the efficiency of the sputtering process, through the installation of magnets outside the vacuum chamber. Within the internal space of the low pressure chamber, plasma generated from the combination of a rarefied gas and an electric field is influenced interactively. Since the quality of the sputtering and deposition rate on the substrate is strongly dependent on the multi-physical phenomena of the plasma regime, numerical simulations using PIC-MCC (Particle In Cell, Monte Carlo Collision) should be employed to develop an efficient sputtering device. In this paper, the development of a magnetron sputtering simulator based on the PIC-MCC method and the associated numerical techniques are discussed. To solve the electric field equations in the 2-D Cartesian domain, a Poisson equation solver based on the FDM (Finite Differencing Method) is developed and coupled with the Monte Carlo Collision method to simulate the motion of gas particles influenced by an electric field. The magnetic field created from the permanent magnet installed outside the vacuum chamber is also numerically calculated using Biot-Savart's Law. All numerical methods employed in the present PIC code are validated by comparison with analytical and well-known commercial engineering software results, with all of the results showing good agreement. Finally, the developed PIC-MCC code is parallelized to be suitable for general purpose computing on graphics processing unit (GPGPU) acceleration, so as to reduce the large computation time which is generally required for particle simulations. The efficiency and accuracy of the GPGPU parallelized magnetron sputtering simulator are examined by comparison with the calculated results and computation times from the original serial code. It is found that

  2. Measurements and Modelling of Sputtering Rates with Low Energy Ions

    Science.gov (United States)

    Ruzic, David N.; Smith, Preston C.; Turkot, Robert B., Jr.

    1996-10-01

    The angular-resolved sputtering yield of Be by D+, and Al by Ar+ was predicted and then measured. A 50 to 1000 eV ion beam from a Colutron was focused on to commercial grade and magnetron target grade samples. The S-65 C grade beryllium samples were supplied by Brush Wellman and the Al samples from TOSOH SMD. In our vacuum chamber the samples can be exposed to a dc D or Ar plasma to remove oxide, load the surface and more-nearly simulate steady state operating conditions in the plasma device. The angular distribution of the sputtered atoms was measured by collection on a single crystal graphite witness plate. The areal density of Be or Al (and BeO2 or Al2O3, after exposure to air) was then measured using a Scanning Auger Spectrometer. Total yield was also measured by deposition onto a quartz crystal oscillator simultaneously to deposition onto the witness plate. A three dimensional version of vectorized fractal TRIM (VFTRIM3D), a Monte-Carlo computer code which includes surface roughness characterized by fractal geometry, was used to predict the angular distribution of the sputtered particles and a global sputtering coefficient. Over a million trajectories were simulated for each incident angle to determine the azimuthal and polar angle distributions of the sputtered atoms. The experimental results match closely with the simulations for total yield, while the measured angular distributions depart somewhat from the predicted cosine curve.

  3. Estimation of the Efficiency of Material Injection into the Reflex Discharge by Sputtering the Cathode Material

    CERN Document Server

    Kovtun, Yu V; Skibenko, A I; Yuferov, V B

    2012-01-01

    The processes of injection of a sputtered-and-ionized working material into the pulsed reflex discharge plasma have been considered at the initial stage of dense gas-metal plasma formation. A calculation model has been proposed to estimate the parameters of the sputtering mechanism for the required working material to be injected into the discharge. The data obtained are in good accordance with experimental results.

  4. Perspective on the Role of Negative Ions and Ion-Ion Plasmas in Heavy Ion Fusion Science, Magnetic Fusion Energy, and Related Fields

    Energy Technology Data Exchange (ETDEWEB)

    L. Grisham and J.W. Kwan

    2008-08-12

    Some years ago it was suggested that halogen negative ions [1] could offer a feasible alternative path to positive ions as a heavy ion fusion driver beam which would not suffer degradation due to electron accumulation in the accelerator and beam transport system, and which could be converted to a neutral beam by photodetachment near the chamber entrance if desired. Since then, experiments have demonstrated that negative halogen beams can be extracted and accelerated away from the gas plume near the source with a surviving current density close to what could be achieved with a positive ion of similar mass, and with comparable optical quality. In demonstrating the feasibility of halogen negative ions as heavy ion driver beams, ion - ion plasmas, an interesting and somewhat novel state of matter, were produced. These plasmas, produced near the extractor plane of the sources, appear, based upon many lines of experimental evidence, to consist of almost equal densities of positive and negative chlorine ions, with only a small component of free electrons. Serendipitously, the need to extract beams from this plasma for driver development provides a unique diagnostic tool to investigate the plasma, since each component - positive ions, negative ions, and electrons -- can be extracted and measured separately. We discuss the relevance of these observations to understanding negative ion beam extraction from electronegative plasmas such as halogens, or the more familiar hydrogen of magnetic fusion ion sources. We suggest a concept which might improve negative hydrogen extraction by the addition of a halogen. The possibility and challenges of producing ion-ion plasmas with thin targets of halogens or, perhaps, salt, is briefly addressed.

  5. Perspective on the Role of Negative Ions and Ion-Ion Plasmas in Heavy Ion Fusion Science, Magnetic Fusion Energy, and Related Fields

    Energy Technology Data Exchange (ETDEWEB)

    Grisham, L.R.; Kwan, J.W.

    2008-08-01

    Some years ago it was suggested that halogen negative ions [1]could offer a feasible alternative path to positive ions as a heavy ion fusion driver beam which would not suffer degradation due to electron accumulation in the accelerator and beam transport system, and which could be converted to a neutral beam by photodetachment near the chamber entrance if desired. Since then, experiments have demonstrated that negative halogen beams can be extracted and accelerated away from the gas plume near the source with a surviving current density close to what could be achieved with a positive ion of similar mass, and with comparable optical quality. In demonstrating the feasibility of halogen negative ions as heavy ion driver beams, ion - ion plasmas, an interesting and somewhat novel state of matter, were produced. These plasmas, produced near the extractor plane of the sources, appear, based upon many lines of experimental evidence, to consist of almost equal densities of positive and negative chlorine ions, with only a small component of free electrons. Serendipitously, the need to extract beams from this plasma for driver development provides a unique diagnostic tool to investigate the plasma, since each component - positive ions, negative ions, and electrons -- can be extracted and measured separately. We discuss the relevance of these observations to understanding negative ion beam extraction from electronegative plasmas such as halogens, or the more familiar hydrogen of magnetic fusion ion sources. We suggest a concept which might improve negative hydrogen extraction by the addition of a halogen. The possibility and challenges of producing ion-ion plasmas with thin targets of halogens or, perhaps, salt, is briefly addressed.

  6. Perspective on the Role of Negative Ions and Ion-Ion Plasmas in Heavy Ion Fusion Science, Magnetic Fusion Energy,and Related Fields

    Energy Technology Data Exchange (ETDEWEB)

    Grisham, L. R.; Kwan, J. W.

    2008-08-01

    Some years ago it was suggested that halogen negative ions could offer a feasible alternative path to positive ions as a heavy ion fusion driver beam which would not suffer degradation due to electron accumulation in the accelerator and beam transport system, and which could be converted to a neutral beam by photodetachment near the chamber entrance if desired. Since then, experiments have demonstrated that negative halogen beams can be extracted and accelerated away from the gas plume near the source with a surviving current density close to what could be achieved with a positive ion of similar mass, and with comparable optical quality. In demonstrating the feasibility of halogen negative ions as heavy ion driver beams, ion - ion plasmas, an interesting and somewhat novel state of matter, were produced. These plasmas, produced near the extractor plane of the sources, appear, based upon many lines of experimental evidence, to consist of almost equal densities of positive and negative chlorine ions, with only a small component of free electrons. Serendipitously, the need to extract beams from this plasma for driver development provides a unique diagnostic tool to investigate the plasma, since each component - positive ions, negative ions, and electrons - can be extracted and measured separately. We discuss the relevance of these observations to understanding negative ion beam extraction from electronegative plasmas such as halogens, or the more familiar hydrogen of magnetic fusion ion sources. We suggest a concept which might improve negative hydrogen extraction by the addition of a halogen. The possibility and challenges of producing ion - ion plasmas with thin targets of halogens or, perhaps, salt, is briefly addressed.

  7. Smoothing of Discharge Inhomogeneities at High Currents in Gasless High Power Impulse Magnetron Sputtering

    CERN Document Server

    Andersson, Joakim; Anders, André

    2014-01-01

    The discharges in high power impulse magnetron sputtering (HiPIMS) have been reported to consist of azimuthally inhomogeneous plasma with locally increased light emission. The luminous zones seemingly travel around the racetrack and are implicated in generation of the high ion kinetic energies observed in HiPIMS. We show that the inhomogeneities smooth out at high discharge current to yield azimuthally homogeneous plasma. This may have implications for the spatial and kinetic energy distribution of sputtered particles, and therefore also on the thin films deposited by high power impulse magnetron sputtering.

  8. Sputtering in supported cluster arrays

    Energy Technology Data Exchange (ETDEWEB)

    Jiménez-Sáez, J.C., E-mail: jc.jimenez@upm.es [Dept. Física Aplicada a la Ingeniería Aeronáutica y Naval, ETSIAE, Universidad Politécnica de Madrid (UPM), 28040 Madrid (Spain); Pérez-Martín, A.M.C.; Jiménez-Rodríguez, J.J. [Dept. Física Aplicada III, Facultad de Ciencias Físicas, Universidad Complutense de Madrid (UCM), 28040 Madrid (Spain)

    2015-06-01

    Bombardment of periodical arrays formed by Co nanoislands deposited on a Cu(0 0 1) substrate with 1-keV argon ions is simulated by using molecular dynamics. Sputtering yield is analyzed distinguishing between particles sputtered across the supported cluster surface and across the flat substrate surface without nanoparticle above. The dependence of this magnitude on the height and the periodical spacing between nanoislands has been investigated. Results show that this dependence for the sputtering across the nanoislands and across the substrate is different. In the case of the total sputtering, the “substrate” effect prevails since the behavior of this magnitude is approximately analogous to the sputtering across the substrate. The more probable causes are analyzed in this article.

  9. A new formula for sputtering yield as function of ion energies at normal incidence

    Science.gov (United States)

    Grais, Kh. I.; Shaltout, A. A.; Ali, S. S.; Boutros, R. M.; El-behery, K. M.; El-Sayed, Z. A.

    2010-04-01

    The statistical ellipsoidal construction has been reconstructed into the statistical conicoidal construction, to describe the sputtering yield, at normal incidence, for various ion energies. The most important advantage of the new volume is the developing of a simple-single equation to describe the sputtering-energy relationship. Its parameters have been pictorially predicted from the conicoidal representation. A correction term [1-( E th/E i) 1/ Ω] was added to the present new equation to describe the threshold energy ( E th) of sputtering. The developed equation could be applied to all available ion/target combinations, over a broadened range of energy for low and heavy ion-masses. The new equation has been differentiated with respect to energy giving rise to a relation between the threshold energy and maximum energy, at which the maximum sputtering yield occurs. It was found that, the obtained theoretical sputtering data for low and heavy ions satisfactorily approaches the available experimental data and works well at the threshold regime. It should be mentioned that the conicoidal model is not only of interest for analytical glow discharge method but also for ion beam method for the sputtering process, where low and high sputtering values could occur.

  10. Hollow metal target magnetron sputter type radio frequency ion source

    Energy Technology Data Exchange (ETDEWEB)

    Yamada, N., E-mail: mwada@mail.doshisha.ac.jp; Kasuya, T.; Wada, M. [Graduate School of Science and Engineering, Doshisha University, Kyoto 610–0321 (Japan); Tsubouchi, N. [Kansai Institute, Advanced Industrial Science and Technology, Osaka 563–8577 (Japan)

    2014-02-15

    A 70 mm diameter 70 mm long compact ion source equipped with a hollow sputtering target has been designed and tested. The hollow sputtering target serves as the radio frequency (RF) plasma excitation electrode at 13.56 MHz. A stable beam of Cu{sup +} has been extracted when Ar was used as the discharge support gas. In the extracted beam, Cu{sup +} had occupied more than 85% of the total ion current. Further increase in Cu{sup +} ions in the beam is anticipated by increasing the RF power and Ar pressure.

  11. Parametric estimate of the relative photon yields from the glasma and the quark-gluon plasma in heavy-ion collisions

    Science.gov (United States)

    Berges, Jürgen; Reygers, Klaus; Tanji, Naoto; Venugopalan, Raju

    2017-05-01

    Recent classical-statistical numerical simulations have established the "bottom-up" thermalization scenario of Baier et al. [Phys. Lett. B 502, 51 (2001), 10.1016/S0370-2693(01)00191-5] as the correct weak coupling effective theory for thermalization in ultrarelativistic heavy-ion collisions. We perform a parametric study of photon production in the various stages of this bottom-up framework to ascertain the relative contribution of the off-equilibrium "glasma" relative to that of a thermalized quark-gluon plasma. Taking into account the constraints imposed by the measured charged hadron multiplicities at Relativistic Heavy Ion Collider (RHIC) and the Large Hadron Collider (LHC), we find that glasma contributions are important especially for large values of the saturation scale at both energies. These nonequilibrium effects should therefore be taken into account in studies where weak coupling methods are employed to compute photon yields.

  12. Time-dependent cylindrical and spherical ion-acoustic solitary structures in relativistic degenerate multi-ion plasmas with positively-charged heavy ions

    Energy Technology Data Exchange (ETDEWEB)

    Hossen, M. R.; Nahar, L.; Mamun, A. A. [Jahangirnagar University,Savar, Dhaka (Bangladesh)

    2014-12-15

    The properties of time-dependent cylindrical and spherical, modified ion-acoustic (mIA) solitary structures in relativistic degenerate multi-ion plasmas (containing degenerate electron fluids, inertial positively-, as well as negatively-, charged light ions, and positively-charged static heavy ions) have been investigated theoretically. This investigation is valid for both non-relativistic and ultrarelativistic limits. The well-known reductive perturbation method has been used to derive the Korteweg-de Vries (K-dV) and the mK-dV equations for studying the basic features of solitary waves. The fundamental characteristics of mIA solitary waves are found to be significantly modified by the effects of the degenerate pressures of the electron and the ion fluids, their number densities, and the various charge states of heavy ions. The relevance of our results in astrophysical compact objects like white dwarfs and neutron stars, which are of scientific interest, is briefly discussed.

  13. Review of strategies for a comprehensive simulation in sputtering devices

    CERN Document Server

    Gentile, Antonio A

    2012-01-01

    The development of sputtering facilities, at the moment, is mainly pursued through experimental tests, or simply by expertise in the field, and relies much less on numerical simulation of the process environment. This leads to great efforts and empirically, roughly optimized solutions: in fact, the simulation of these devices, at the state of art, is quite good in predicting the behavior of single steps of the overall deposition process, but it seems still ahead a full integration among the tools simulating the various phenomena involved in a sputter. We summarize here the techniques and codes already available for problems of interest in sputtering facilities, and we try to outline the possible features of a comprehensive simulation framework. This framework should be able to integrate the single paradigms, dealing with aspects going from the plasma environment up to the distribution and properties of the deposited film, not only on the surface of the substrate, but also on the walls of the process chamber.

  14. Applying Bayesian parameter estimation to relativistic heavy-ion collisions: simultaneous characterization of the initial state and quark-gluon plasma medium

    CERN Document Server

    Bernhard, Jonah E; Bass, Steffen A; Liu, Jia; Heinz, Ulrich

    2016-01-01

    We quantitatively estimate properties of the quark-gluon plasma created in ultra-relativistic heavy-ion collisions utilizing Bayesian statistics and a multi-parameter model-to-data comparison. The study is performed using a recently developed parametric initial condition model, TRENTO, which interpolates among a general class of particle production schemes, and a modern hybrid model which couples viscous hydrodynamics to a hadronic cascade. We calibrate the model to multiplicity, transverse momentum, and flow data and report constraints on the parametrized initial conditions and the temperature-dependent transport coefficients of the quark-gluon plasma. We show that initial entropy deposition is consistent with a saturation-based picture, extract a relation between the minimum value and slope of the temperature-dependent specific shear viscosity, and find a clear signal for a nonzero bulk viscosity.

  15. Sputtering. [as deposition technique in mechanical engineering

    Science.gov (United States)

    Spalvins, T.

    1976-01-01

    This paper primarily reviews the potential of using the sputtering process as a deposition technique; however, the manufacturing and sputter etching aspects are also discussed. Since sputtering is not regulated by classical thermodynamics, new multicomponent materials can be developed in any possible chemical composition. The basic mechanism for dc and rf sputtering is described. Sputter-deposition is described in terms of the unique advantageous features it offers such as versatility, momentum transfer, stoichiometry, sputter-etching, target geometry (coating complex surfaces), precise controls, flexibility, ecology, and sputtering rates. Sputtered film characteristics, such as strong adherence and coherence and film morphology, are briefly evaluated in terms of varying the sputtering parameters. Also described are some of the specific industrial areas which are turning to sputter-deposition techniques.

  16. Sputtering. [as deposition technique in mechanical engineering

    Science.gov (United States)

    Spalvins, T.

    1976-01-01

    This paper primarily reviews the potential of using the sputtering process as a deposition technique; however, the manufacturing and sputter etching aspects are also discussed. Since sputtering is not regulated by classical thermodynamics, new multicomponent materials can be developed in any possible chemical composition. The basic mechanism for dc and rf sputtering is described. Sputter-deposition is described in terms of the unique advantageous features it offers such as versatility, momentum transfer, stoichiometry, sputter-etching, target geometry (coating complex surfaces), precise controls, flexibility, ecology, and sputtering rates. Sputtered film characteristics, such as strong adherence and coherence and film morphology, are briefly evaluated in terms of varying the sputtering parameters. Also described are some of the specific industrial areas which are turning to sputter-deposition techniques.

  17. Reactive high power impulse magnetron sputtering: combining simulation and experiment

    Science.gov (United States)

    Kozak, Tomas; Vlcek, Jaroslav

    2016-09-01

    Reactive high-power impulse magnetron sputtering (HiPIMS) has recently been used for preparation of various oxide films with high application potential, such as TiO2, ZrO2, Ta2O5, HfO2, VO2. Using our patented method of pulsed reactive gas flow control with an optimized reactive gas inlet, we achieved significantly higher deposition rates compared to typical continuous dc magnetron depositions. We have developed a time-dependent model of the reactive HiPIMS. The model includes a depth-resolved description of the sputtered target (featuring sputtering, implantation and knock-on implantation processes) and a parametric description of the discharge plasma (dissociation of reactive gas, ionization and return of sputtered atoms and gas rarefaction). The model uses a combination of experimental and simulation data as input. We have calculated the composition of the target and substrate for several deposition conditions. The simulations predict a reduced compound coverage of the target in HiPIMS compared to the continuous dc sputtering regime which explains the increased deposition rate. The simulations show that an increased dissociation of oxygen in a HiPIMS discharge is beneficial to achieve stoichiometric films on the substrate at high deposition rates.

  18. Multielement determination of heavy metals in water samples by continuous powder introduction microwave-induced plasma atomic emission spectrometry after preconcentration on activated carbon

    Science.gov (United States)

    Jankowski, Krzysztof; Yao, Jun; Kasiura, Krzysztof; Jackowska, Adrianna; Sieradzka, Anna

    2005-03-01

    A novel continuous powder introduction microwave-induced plasma atomic emission spectrometry method (CPI-MIP-AES) has been developed for trace determination of metals in ground and tap water samples after preconcentration on activated carbon. The experimental setup consisted of integrated rectangular cavity TE 101 and vertically positioned plasma torch. The technical arrangement of the sample introduction system has been designed based on the fluidized bed concept. The satisfactory signal stability required for sequential analysis was attained owing to the vertical plasma configuration, as well as the plasma gas flow rate compatibility with sample introduction flow rate. The elements of interest (Cd, Cu, Cr, Fe, Mn, Pb, Zn) were preconcentrated in a batch procedure at pH 8-8.5 after addition of activated carbon and then, after filtering and drying of the activated carbon suspension, introduced to the MIP by the CPI system. An enrichment factor of about 1000-fold for a sample volume of 1 l was obtained. The detection limit values for the proposed method were 17-250 ng l -1. The proposed method was validated by analyzing the certified reference materials: SRW "Warta" Synthetic River Water and BCR CRM 399 major elements in freshwater. The method was successfully applied to the determination of the heavy metals in tap water samples.

  19. Multielement determination of heavy metals in water samples by continuous powder introduction microwave-induced plasma atomic emission spectrometry after preconcentration on activated carbon

    Energy Technology Data Exchange (ETDEWEB)

    Jankowski, Krzysztof [Warsaw University of Technology, Faculty of Chemistry, Department of Analytical Chemistry, 00-664 Warsaw, ul. Noakowskiego 3 (Poland)]. E-mail: kj@ch.pw.edu.pl; Yao Jun [College of Chemistry and Chemical Engineering, Jishou University, 120 Renmin South Road, Jishou 416000 (China); Kasiura, Krzysztof [Warsaw University of Technology, Faculty of Chemistry, Department of Analytical Chemistry, 00-664 Warsaw, ul. Noakowskiego 3 (Poland); Jackowska, Adrianna [Warsaw University of Technology, Faculty of Chemistry, Department of Analytical Chemistry, 00-664 Warsaw, ul. Noakowskiego 3 (Poland); Sieradzka, Anna [Warsaw University of Technology, Faculty of Chemistry, Department of Analytical Chemistry, 00-664 Warsaw, ul. Noakowskiego 3 (Poland)

    2005-03-31

    A novel continuous powder introduction microwave-induced plasma atomic emission spectrometry method (CPI-MIP-AES) has been developed for trace determination of metals in ground and tap water samples after preconcentration on activated carbon. The experimental setup consisted of integrated rectangular cavity TE{sub 101} and vertically positioned plasma torch. The technical arrangement of the sample introduction system has been designed based on the fluidized bed concept. The satisfactory signal stability required for sequential analysis was attained owing to the vertical plasma configuration, as well as the plasma gas flow rate compatibility with sample introduction flow rate. The elements of interest (Cd, Cu, Cr, Fe, Mn, Pb, Zn) were preconcentrated in a batch procedure at pH 8-8.5 after addition of activated carbon and then, after filtering and drying of the activated carbon suspension, introduced to the MIP by the CPI system. An enrichment factor of about 1000-fold for a sample volume of 1 l was obtained. The detection limit values for the proposed method were 17-250 ng l{sup -1}. The proposed method was validated by analyzing the certified reference materials: SRW 'Warta' Synthetic River Water and BCR CRM 399 major elements in freshwater. The method was successfully applied to the determination of the heavy metals in tap water samples.

  20. A high-throughput solid-phase extraction microchip combined with inductively coupled plasma-mass spectrometry for rapid determination of trace heavy metals in natural water.

    Science.gov (United States)

    Shih, Tsung-Ting; Hsieh, Cheng-Chuan; Luo, Yu-Ting; Su, Yi-An; Chen, Ping-Hung; Chuang, Yu-Chen; Sun, Yuh-Chang

    2016-04-15

    Herein, a hyphenated system combining a high-throughput solid-phase extraction (htSPE) microchip with inductively coupled plasma-mass spectrometry (ICP-MS) for rapid determination of trace heavy metals was developed. Rather than performing multiple analyses in parallel for the enhancement of analytical throughput, we improved the processing speed for individual samples by increasing the operation flow rate during SPE procedures. To this end, an innovative device combining a micromixer and a multi-channeled extraction unit was designed. Furthermore, a programmable valve manifold was used to interface the developed microchip and ICP-MS instrumentation in order to fully automate the system, leading to a dramatic reduction in operation time and human error. Under the optimized operation conditions for the established system, detection limits of 1.64-42.54 ng L(-1) for the analyte ions were achieved. Validation procedures demonstrated that the developed method could be satisfactorily applied to the determination of trace heavy metals in natural water. Each analysis could be readily accomplished within just 186 s using the established system. This represents, to the best of our knowledge, an unprecedented speed for the analysis of trace heavy metal ions. Copyright © 2016 Elsevier B.V. All rights reserved.

  1. The creation of strongly coupled plasmas using an intense heavy ion beam: low-entropy compression of hydrogen and the problem of hydrogen metallization

    CERN Document Server

    Tahir, N A; Shutov, A; Varentsov, D; Udrea, S; Hoffmann, Dieter H H; Juranek, H; Redmer, R; Portugues, R F; Lomonosov, I V; Fortov, V E

    2003-01-01

    Intense heavy ion beams deposit energy very efficiently over extended volumes of solid density targets, thereby creating large samples of strongly coupled plasmas. Intense beams of energetic heavy ions are therefore an ideal tool to research this interesting field. It is also possible to design experiments using special beam-target geometries to achieve low-entropy compression of samples of matter. This type of experiments is of particular interest for studying the problem of hydrogen metallization. In this paper we present a design study of such a proposed experiment that will be carried out at the future heavy ion synchrotron facility SIS100, at the Gesellschaft fuer Schwerionenforschung, Darmstadt. This study has been done using a two-dimensional hydrodynamic computer code. The target consists of a solid hydrogen cylinder that is enclosed in a thick shell of lead whose one face is irradiated with an ion beam which has an annular (ring shaped) focal spot. The beam intensity and other parameters are consider...

  2. The effect of organochlorines and heavy metals on sex steroid-binding proteins in vitro in the plasma of nesting green turtles, Chelonia mydas.

    Science.gov (United States)

    Ikonomopoulou, Maria Petrou; Olszowy, Henry; Hodge, Mary; Bradley, Adrian J

    2009-07-01

    In this study on green turtles, Chelonia mydas, from Peninsular Malaysia, the effect of selected environmental toxicants was examined in vitro. Emphasis was placed on purported hormone-mimicking chemicals such as dichlorodiphenyltrichloroethane (DDT), dichlorodiphenyldichloroethylene, dieldrin, lead, zinc and copper. Five concentrations were used: high (1 mg/L), medium (10(-1) mg/L), low (10(-2) mg/L), very low (10(-6) mg/L) and control (diluted carrier solvent but no toxicants). The results suggest that environmental pesticides and heavy metals may significantly alter the binding of steroids [i.e. testosterone (T) and oestradiol] to the plasma proteins in vitro. Competition studies showed that only Cu competed for binding sites with testosterone in the plasma collected from nesting C. mydas. Dieldrin and all heavy metals competed with oestradiol for binding sites. Furthermore, testosterone binding affinity was affected at various DDT concentrations and was hypothesised that DDT in vivo may act to inhibit steroid-protein interactions in nesting C. mydas. Although the precise molecular mechanism is yet to be described, DDT could have an effect upon the protein conformation thus affecting T binding (e.g. the T binding site on the steroid hormone binding protein molecule).

  3. Evolution of sputtering target surface composition in reactive high power impulse magnetron sputtering

    Science.gov (United States)

    Kubart, T.; Aijaz, A.

    2017-05-01

    The interaction between pulsed plasmas and surfaces undergoing chemical changes complicates physics of reactive High Power Impulse Magnetron Sputtering (HiPIMS). In this study, we determine the dynamics of formation and removal of a compound on a titanium surface from the evolution of discharge characteristics in an argon atmosphere with nitrogen and oxygen. We show that the time response of a reactive process is dominated by surface processes. The thickness of the compound layer is several nm and its removal by sputtering requires ion fluence in the order of 1016 cm-2, much larger than the ion fluence in a single HiPIMS pulse. Formation of the nitride or oxide layer is significantly slower in HiPIMS than in dc sputtering under identical conditions. Further, we explain very high discharge currents in HiPIMS by the formation of a truly stoichiometric compound during the discharge off-time. The compound has a very high secondary electron emission coefficient and leads to a large increase in the discharge current upon target poisoning.

  4. Assessment of heavy metal contamination in core sediment samples in Gulf of Izmir, Aegean Sea, Turkey (by inductively coupled plasma-optical emission spectrometry (ICP-OES))

    Science.gov (United States)

    Ünal Yumun, Zeki; Kam, Erol; Kurt, Dilek

    2017-04-01

    Heavy metal and radionuclide analysis studies are crucial in explaining biotic and abiotic interactions in ecosystems. This type of analysis is highly needed in environments such as coastal areas, gulfs or lakes where human activities are generally concentrated. Sediments are one of the best biological indicators for the environment since the pollution accumulates in the sediments by descent to the sea floor. In this study, sediments were collected from the Gulf of Izmir (Eastern Aegean Sea, Turkey) considering the accumulated points of domestic and industrial wastes to make an anthropogenic pollution analysis. The core sediments had different depths of 0.00-30.00 m at four different locations where Karsiyaka, Bayrakli, Incialti and Cesmealti in the Gulf of Izmir. The purpose of the study was determining Cd, Co, Cr, Cu, Mn, Ni, Pb, and Zn concentrations in the drilling samples to assess their levels and spatial distribution in crucial areas of the Aegean Sea by inductively coupled plasma-optical emission spectrometry (ICP-OES) with microwave digestion techniques. The heavy metal concentrations found in sediments varied for Cd: heavy metals. Keywords: Gulf of Izmir, heavy metals, ICP-OES, pollution, sediment.

  5. Sputtering at Mars: MAVEN observations of precipitating and escaping oxygen during nominal and extreme conditions

    Science.gov (United States)

    Curry, Shannon; Luhmann, Janet; Dong, Chuanfei; Ma, Yingjuan; Leblanc, Francois; Modolo, Ronan; Brain, David; Gruesbeck, Jacob; Hara, Takuya; Halekas, Jasper; Dong, Yaxue; Williamson, Hayley N.; Johnson, Robert E.; McFadden, James; Espley, Jared R.; Mitchell, David; Connerney, Jack; Eparvier, Frank; Lillis, Robert J.; Jakosky, Bruce

    2016-10-01

    Sputtering is believed to be one of the dominant escape mechanisms during the early epochs of our solar system when the solar activity and EUV intensities were much higher than the present day. Mars lacks a global dynamo magnetic field, which creates a scenario where the solar wind directly interacts with the upper atmosphere and newly created ions can be picked up and swept away by the background convection electric field. These pick-up ions can directly escape or precipitate back into the atmosphere and induce atmospheric sputtering of neutrals.The MAVEN spacecraft has observed the Mars upper atmosphere, ionosphere, magnetic topology and interactions with the Sun and solar wind during numerous Interplanetary Coronal Mass Ejection (ICME) impacts spanning from March 2015 to June 2016. ICMEs are associated with enhanced solar wind velocities, densities and magnetic field strength, and often drive heavy ion precipitation at much higher rates than during nominal conditions. Thus, ICMEs provide a unique environment for observing sputtering. We will compare MAVEN observations of heavy ion precipitation during nominal conditions as well as during ICMEs. Additionally, we will present global MHD and test particle simulations of the ICMEs in order to calculate sputtering escape rates for oxygen. Finally, we will use the observed and modeled sputtering escape rates to provide an initial estimate of the total sputtered atmospheric escape from Mars over billions of years.

  6. Effects of hydrogen-damaged layer on tin-doped indium oxide etching by H2/Ar plasma

    Science.gov (United States)

    Hirata, Akiko; Fukasawa, Masanaga; Shigetoshi, Takushi; Okamoto, Masaki; Nagahata, Kazunori; Li, Hu; Karahashi, Kazuhiro; Hamaguchi, Satoshi; Tatsumi, Tetsuya

    2017-06-01

    The etch rate of tin-doped indium oxide (or indium tin oxide, ITO) and the effects of a hydrogen-damaged layer caused by H2/Ar plasma were investigated using several surface analysis techniques. The ITO etch rate strongly depended on the H2/Ar flow rate ratio. The ITO was reduced by hydrogen injection and generated an In-rich (hydrogen-induced damage) layer on the surface. Because this In-rich layer had a higher sputtering yield, the hydrogen-damaged layer enhanced the ITO etch rate. Thus, the etching of ITO in H2/Ar plasma is determined by the balance between the formation of the In-rich damaged layer by H ion irradiation and the sputtering by Ar (relatively heavy inert gas) ions.

  7. Relativistically induced transparency acceleration of light ions by an ultrashort laser pulse interacting with a heavy-ion-plasma density gradient

    Science.gov (United States)

    Sahai, Aakash A.; Tsung, Frank S.; Tableman, Adam R.; Mori, Warren B.; Katsouleas, Thomas C.

    2013-10-01

    The relativistically induced transparency acceleration (RITA) scheme of proton and ion acceleration using laser-plasma interactions is introduced, modeled, and compared to the existing schemes. Protons are accelerated with femtosecond relativistic pulses to produce quasimonoenergetic bunches with controllable peak energy. The RITA scheme works by a relativistic laser inducing transparency [Akhiezer and Polovin, Zh. Eksp. Teor. Fiz 30, 915 (1956); Kaw and Dawson, Phys. FluidsPFLDAS0031-917110.1063/1.1692942 13, 472 (1970); Max and Perkins, Phys. Rev. Lett.PRLTAO0031-900710.1103/PhysRevLett.27.1342 27, 1342 (1971)] to densities higher than the cold-electron critical density, while the background heavy ions are stationary. The rising laser pulse creates a traveling acceleration structure at the relativistic critical density by ponderomotively [Lindl and Kaw, Phys. FluidsPFLDAS0031-917110.1063/1.1693437 14, 371 (1971); Silva , Phys. Rev. E1063-651X10.1103/PhysRevE.59.2273 59, 2273 (1999)] driving a local electron density inflation, creating an electron snowplow and a co-propagating electrostatic potential. The snowplow advances with a velocity determined by the rate of the rise of the laser's intensity envelope and the heavy-ion-plasma density gradient scale length. The rising laser is incrementally rendered transparent to higher densities such that the relativistic-electron plasma frequency is resonant with the laser frequency. In the snowplow frame, trace density protons reflect off the electrostatic potential and get snowplowed, while the heavier background ions are relatively unperturbed. Quasimonoenergetic bunches of velocity equal to twice the snowplow velocity can be obtained and tuned by controlling the snowplow velocity using laser-plasma parameters. An analytical model for the proton energy as a function of laser intensity, rise time, and plasma density gradient is developed and compared to 1D and 2D PIC OSIRIS [Fonseca , Lect. Note Comput. Sci.9783

  8. Nanoscale zero-valent iron particles supported on reduced graphene oxides by using a plasma technique and their application for removal of heavy-metal ions.

    Science.gov (United States)

    Li, Jie; Chen, Changlun; Zhang, Rui; Wang, Xiangke

    2015-06-01

    Nanoscale zero-valent iron particles supported on reduced graphene oxides (NZVI/rGOs) from spent graphene oxide (GO)-bound iron ions were developed by using a hydrogen/argon plasma reduction method to improve the reactivity and stability of NZVI. The NZVI/rGOs exhibited excellent water treatment performance with excellent removal capacities of 187.16 and 396.37 mg g(-1) for chromium and lead, respectively. Moreover, the NZVI/rGOs could be regenerated by plasma treatment and maintained high removal ability after four cycles. X-ray photoelectron spectroscopy analysis results implied that the removal mechanisms could be attributed to adsorption/precipitation, reduction, or both. Such multiple removal mechanisms by the NZVI/rGOs were attributed to the reduction ability of the NZVI particles and the role of dispersing and stabilizing abilities of the rGOs. The results indicated that the NZVI/rGOs prepared by a hydrogen/argon plasma reduction method might be an effective composite for heavy-metal-ion removal.

  9. Very low pressure high power impulse triggered magnetron sputtering

    Science.gov (United States)

    Anders, Andre; Andersson, Joakim

    2013-10-29

    A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.

  10. Study on the Heavy Metal Bioconcentrations of the Shadegan International Wetland Mosquitofish, Gambusia Affinis, by Inductively Coupled Plasma Technique

    Directory of Open Access Journals (Sweden)

    Hassan Nasirian

    2013-07-01

    Full Text Available The purpose of this study was to evaluate the levels of heavy metal bioconcentration of the mosquitofish (Gambusia affinis in Shadegan international wetland. Sampling including the water, waterbed sediment and mosquitofish was carried out from the selected sampling sites during October and November 2011, and analyzed by the ICP-OES. Results show that the water has poor qualitative condition, according to EPA and WHO water quality standards. The level of the water Cr in the selected sites in both months and the levels of Fe, Mn and Zn during October in the SW1 site were higher than the instrumental detection limits indicating that the water was contaminated with these metals in the mentioned sites and months. The levels of the waterbed sediment As, Co, Cr, Cu, Fe, Mn, Pb and Zn, and mosquitofish Cr, Cu, Fe, Mn, Zn, Co and Cd were much higher than the instrumental detection limits, indicating that the waterbed sediment and mosquitofish were contaminated with them during October and November in the selected sites. Statistical assessments reveal that there is a significant difference between the mentioned contaminated water, waterbed sediment and mosquitofish heavy metals (all P-values < 0.05. In overall, it is considered that the contaminated heavy metals can be accumulated in the waterbed sediment and bioconcentrated in the wildlife tissues, then finally can be entered in the marine food chains and biomagnified there after long periods. In conclusion, this paper confirmed that the G. affinis can be used as a bioindicator of heavy metal pollution in marine ecosystems such as wetlands

  11. Using the Multipole Resonance Probe to Stabilize the Electron Density During a Reactive Sputter Process

    Science.gov (United States)

    Oberberg, Moritz; Styrnoll, Tim; Ries, Stefan; Bienholz, Stefan; Awakowicz, Peter

    2015-09-01

    Reactive sputter processes are used for the deposition of hard, wear-resistant and non-corrosive ceramic layers such as aluminum oxide (Al2O3) . A well known problem is target poisoning at high reactive gas flows, which results from the reaction of the reactive gas with the metal target. Consequently, the sputter rate decreases and secondary electron emission increases. Both parameters show a non-linear hysteresis behavior as a function of the reactive gas flow and this leads to process instabilities. This work presents a new control method of Al2O3 deposition in a multiple frequency CCP (MFCCP) based on plasma parameters. Until today, process controls use parameters such as spectral line intensities of sputtered metal as an indicator for the sputter rate. A coupling between plasma and substrate is not considered. The control system in this work uses a new plasma diagnostic method: The multipole resonance probe (MRP) measures plasma parameters such as electron density by analyzing a typical resonance frequency of the system response. This concept combines target processes and plasma effects and directly controls the sputter source instead of the resulting target parameters.

  12. Sputtering and codeposition of silicon carbide with deuterium

    Science.gov (United States)

    Causey, Rion A.

    2003-03-01

    Due to its excellent thermal properties, silicon carbide is being considered as a possible plasma-facing material for fusion devices. If used as a plasma-facing material, the energetic hydrogen isotope ions and charge-exchanged neutrals escaping from the plasma will sputter the silicon carbide. To assess the tritium inventory problems that will be generated by the use of this material, it is necessary that we know the codeposition properties of the redeposited silicon carbide. To determine the codeposition properties, the deuterium plasma experiment at Sandia National Laboratories in Livermore, California has been used to directly compare the deuterium sputtering and codeposition of silicon carbide with that of graphite. A Penning discharge at a flux of 6×10 19 D/m 2 and an energy of ≈300 eV was used to sputter silicon and carbon from a pair of 0.05 m diameter silicon carbide disks. The removal rate of deuterium gas from the fixed volume of the system isolated from all other sources and sinks was used to measure the codeposition probability (probability that a hydrogen isotope atom will be removed through codeposition per ion striking the sample surface). A small catcher plate used to capture a fraction of the codeposited film was analyzed using Auger spectroscopy. This analysis showed the film to begin with a high carbon to silicon ratio due to preferential sputtering of the carbon. As the film became thicker, the ratio of the depositing material changed over to the (1:1) value that must eventually be attained.

  13. Sputtering of a silicon surface: Preferential sputtering of surface impurities

    Energy Technology Data Exchange (ETDEWEB)

    Nietiadi, Maureen L. [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany); Rosandi, Yudi [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany); Department of Physics, Universitas Padjadjaran, Jatinangor, Sumedang 45363 (Indonesia); Lorinčík, Jan [Faculty of Science, J. E. Purkinje University, České mládeže 8, 400 96 Ústí nad Labem (Czech Republic); Institute of Photonics and Electronics, Academy of Sciences of the Czech Republic, Chaberská 57, 182 51 Praha (Czech Republic); Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.de [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany)

    2013-05-15

    We present molecular-dynamics simulations of the sputtering of an impurity atom off a Si 2×1 (100) surface by 2 keV Ar ions. The impurity is characterized by its mass and its binding energy to the Si substrate. We find that sputtering strongly decreases with the mass and even more strongly with the binding energy of the impurity atom to the matrix. The velocity of the impurity perpendicular to the surface is reduced with increasing impurity mass and binding energy. In terms of available ionization theories we can conclude that heavier impurities will have a smaller ionization probability.

  14. Ionized magnetron sputtering of aluminum(,2)oxygen(,3)

    Science.gov (United States)

    Gonzalez, Patrick Fernando

    2000-10-01

    This dissertation shows a detailed study of the conditions necessary for sputtering alumina using a novel variant of ionized magnetron sputtering (IMS) first demonstrated by Yamashita et. al. The study presented herein leverages concurrent research at our laboratory on high density plasmas, plasma characterization and charged particle beams research to demonstrate a new source capable of sputtering hydrated alumina films at high rates. High quality ceramics such as Al2O3 find uses in a variety of applications, and in particular, for mass storage applications. Consequently, there exists an ever-growing need to provide and improve the capability of growing thick insulating films. Ideally, the insulating film should be stoichiometric and able to be grown at rates high enough to be easily manufacturable. Alumina is a particularly attractive due to its high density, Na barrier properties, and stability and radiation resistance. However, high quality films are often difficult to achieve with conventional RF plasma due to extremely slow deposition rates and difficulties associated with system cooling. The preferred method is to reactively sputter Al from a solid target in an O2 ambient. Nevertheless, this process is inherently unstable and leads to arcing and uneven target wear when magnetrons are used. In this study, we build the sputtering source, evaluate, and maximize the deposition characteristics of alumina films sputtered from a solid target in an Ar/O2 ambient. Semi-crystalline (kappa + theta) alumina has been reported using a similar technique at temperatures as low 370 C. The difference in the system used herein is that RF power is used for both, the inductive and capacitive components. Additionally, we use a solid target made of sintered alumina throughout the experiment. A model is developed using regression analysis and compared to results obtained. Because plasma parameters can interact with each other, we explore ICP/CCP power interactions and gas influence

  15. Investigation of heavy ions diffusion under the influence of current-driven mechanism and compositional waves in plasma

    CERN Document Server

    Urpin, Vadim

    2016-01-01

    We consider diffusion caused by a combined influence of the Hall effect and electric currents, and argue that such diffusion forms chemical inhomogeneities in plasma. The considered mechanism can be responsible for the formation of element spots in laboratory and astrophysical plasmas. Such current-driven diffusion can be accompanied by the propagation of a particular type of waves which have not been considered earlier. In these waves, the impurity number density oscillare alone and their frequency is determined by the electric currents and sort of impurity ions. These compositional waves exist if the magnetic pressure in plasma is much greater than the gas pressure. Such waves lead to local variations of chemical composition and, hence, can manifest themselves by variations of the emission in spectral lines.

  16. The dynamic changes of the plasma membrane proteins and the protective roles of nitric oxide in rice subjected to heavy metal cadmium stress

    Directory of Open Access Journals (Sweden)

    Liming eYang

    2016-02-01

    Full Text Available The heavy metal cadmium is a common environmental contaminant in soils and has adverse effects on crop growth and development. The signaling processes in plants that initiate cellular responses to environmental stress have been shown to be located in the plasma membrane (PM. A better understanding of the PM proteome in response to environmental stress might provide new insights for improving stress-tolerant crops. Nitric oxide (NO is reported to be involved in the plant response to cadmium (Cd stress. To further investigate how NO modulates protein changes in the plasma membrane during Cd stress, a quantitative proteomics approach based on isobaric tags for relative and absolute quantification (iTRAQ was used to identify differentially regulated proteins from the rice plasma membrane after Cd or Cd and NO treatment. Sixty-six differentially expressed proteins were identified, of which, many function as transporters, ATPases, kinases, metabolic enzymes, phosphatases and phospholipases. Among these, the abundance of phospholipase D (PLD was altered substantially after the treatment of both Cd and Cd and NO. Transient expression of the PLD fused with green fluorescent peptide (GFP in rice protoplasts showed that the Cd and NO treatment promoted the accumulation of PLD in the plasma membrane. Addition of NO also enhanced Cd-induced PLD activity and the accumulation of phosphatidic acid (PA produced through PLD activity. Meanwhile, NO elevated the activities of antioxidant enzymes and caused the accumulation of glutathione both which function to reduce Cd-induced H2O2 accumulation. Taken together, we suggest that NO signaling is associated with the accumulation of antioxidant enzymes, glutathione and PA which increases cadmium tolerance in rice via the antioxidant defense system.

  17. Effect of magnetic field on the photon radiation from quark-gluon plasma in heavy ion collisions

    CERN Document Server

    Zakharov, B G

    2016-01-01

    We develop a formalism for the photon emission from the quark-gluon plasma with an external electromagnetic field. We then use it to investigate the effect of magnetic field on the photon emission from the quark-gluon plasma created in $AA$ collisions. We find that even for very optimistic assumption on the magnitude of the magnetic field generated in $AA$ collisions its effect on the photon emission rate is practically negligible. For this reason the magnetic field cannot generate a significant azimuthal asymmetry in the photon spectrum.

  18. Effect of the magnetic field on the photon radiation from quark-gluon plasma in heavy ion collisions

    Energy Technology Data Exchange (ETDEWEB)

    Zakharov, B.G. [L.D. Landau Institute for Theoretical Physics, Moscow (Russian Federation)

    2016-11-15

    We develop a formalism for the photon emission from the quark-gluon plasma with an external electromagnetic field. We then use it to investigate the effect of the magnetic field on the photon emission from the quark-gluon plasma created in AA collisions. We find that even for a very optimistic assumption on the magnitude of the magnetic field generated in AA collisions its effect on the photon emission rate is practically negligible. For this reason the magnetic field cannot generate a significant azimuthal asymmetry in the photon spectrum. (orig.)

  19. A dipole-assisted solid-phase extraction microchip combined with inductively coupled plasma-mass spectrometry for online determination of trace heavy metals in natural water.

    Science.gov (United States)

    Shih, Tsung-Ting; Hsu, I-Hsiang; Chen, Shun-Niang; Chen, Ping-Hung; Deng, Ming-Jay; Chen, Yu; Lin, Yang-Wei; Sun, Yuh-Chang

    2015-01-21

    We employed a polymeric material, poly(methyl methacrylate) (PMMA), for fabricating a microdevice and then implanted the chlorine (Cl)-containing solid-phase extraction (SPE) functionality into the PMMA chip to develop an innovative on-chip dipole-assisted SPE technique. Instead of the ion-ion interactions utilized in on-chip SPE techniques, the dipole-ion interactions between the highly electronegative C-Cl moieties in the channel interior and the positively charged metal ions were employed to facilitate the on-chip SPE procedures. Furthermore, to avoid labor-intensive manual manipulation, a programmable valve manifold was designed as an interface combining the dipole-assisted SPE microchip and inductively coupled plasma-mass spectrometry (ICP-MS) to achieve the fully automated operation. Under the optimized operation conditions for the established system, the detection limits for each analyte ion were obtained based on three times the standard deviation of seven measurements of the blank eluent solution. The limits ranged from 3.48 to 20.68 ng L(-1), suggesting that this technique appears uniquely suited for determining the levels of heavy metal ions in natural water. Indeed, a series of validation procedures demonstrated that the developed method could be satisfactorily applied to the determination of trace heavy metals in natural water. Remarkably, the developed device was durable enough to be reused more than 160 times without any loss in its analytical performance. To the best of our knowledge, this is the first study reporting on the combination of a dipole-assisted SPE microchip and elemental analysis instrument for the online determination of trace heavy metal ions.

  20. The creation of strongly coupled plasmas using an intense heavy ion beam: low-entropy compression of hydrogen and the problem of hydrogen metallization

    Energy Technology Data Exchange (ETDEWEB)

    Tahir, N A [Institut fuer Theoretische Physik, Universitaet Frankfurt, Postfach 11 19 32, 60054 Frankfurt (Germany); Piriz, A R [ETSI Industriales, Universidad de Castilla-La Mancha, 13071 Ciudad Real (Spain); Shutov, A [Institute for Problems in Chemical Physics Research, Chernogolovka, Russia (Russian Federation); Varentsov, D [Institut fuer Kernphysik, Technische Universitaet Darmstadt, Schlossgarten Str. 9, 64289 Darmstadt (Germany); Udrea, S [Institut fuer Kernphysik, Technische Universitaet Darmstadt, Schlossgarten Str. 9, 64289 Darmstadt (Germany); Hoffmann, D H H [Institut fuer Kernphysik, Technische Universitaet Darmstadt, Schlossgarten Str. 9, 64289 Darmstadt (Germany); Juranek, H [Fachbereich Physik, Universitaet Rostock, 18051 Rostock (Germany); Redmer, R [Fachbereich Physik, Universitaet Rostock, 18051 Rostock (Germany); Portugues, R F [ETSI Industriales, Universidad de Castilla-La Mancha, 13071 Ciudad Real (Spain); Lomonosov, I [Institute for Problems in Chemical Physics Research, Chernogolovka, Russia (Russian Federation); Fortov, V E [Institute for Problems in Chemical Physics Research, Chernogolovka, Russia (Russian Federation)

    2003-06-06

    Intense heavy ion beams deposit energy very efficiently over extended volumes of solid density targets, thereby creating large samples of strongly coupled plasmas. Intense beams of energetic heavy ions are therefore an ideal tool to research this interesting field. It is also possible to design experiments using special beam-target geometries to achieve low-entropy compression of samples of matter. This type of experiments is of particular interest for studying the problem of hydrogen metallization. In this paper we present a design study of such a proposed experiment that will be carried out at the future heavy ion synchrotron facility SIS100, at the Gesellschaft fuer Schwerionenforschung, Darmstadt. This study has been done using a two-dimensional hydrodynamic computer code. The target consists of a solid hydrogen cylinder that is enclosed in a thick shell of lead whose one face is irradiated with an ion beam which has an annular (ring shaped) focal spot. The beam intensity and other parameters are considered to be the same as expected at the future SIS100 facility. The simulations show that due to multiple shock reflection between the cylinder axis and the lead-hydrogen boundary, one can achieve up to 20 times solid density in hydrogen while keeping the temperature as low as a few thousand K. The corresponding pressure is of the order of 10 Mbar. These values of the physical parameters lie within the range of theoretically predicted values for hydrogen metallization. We have also carried out a parameter study of this problem by varying the target and beam parameters over a wide range. It has been found that the results are very insensitive to such changes in the input parameters.

  1. Laser sputter neutral mass spectrometry

    Energy Technology Data Exchange (ETDEWEB)

    King, B.V.; Clarke, M.; Hu, H.; Betz [Newcastle Univ., NSW (Australia). Dept. of Physics

    1993-12-31

    Laser sputter neutral mass spectrometry (LSNMS) is an emerging technique for highly sensitive surface analysis. In this technique a target is bombarded with a pulsed beam of keV ions. The sputtered particles are intercepted by a high intensity pulsed laser beam above the surface and ionised with almost 100% efficiency. The photions may then be mass analysed using a quadrupole or, more commonly, using time of flight (TOF) techniques. In this method photoions are extracted from the ionisation region, accelerated to a known energy E{sub o} and strike a channelplate detector a distance `d` away. The flight time `t` of the photoions is then related to their mass by `d` {radical}m / {radical} 2E{sub o} so measurement of `t` allows mass spectra to be obtained. It is found that LSNMS is an emerging technique of great sensitivity and flexibility, useful for both applied analysis and to investigate basic sputtering processes. 4 refs., 3 figs.

  2. Elementary surface processes during reactive magnetron sputtering of chromium

    Energy Technology Data Exchange (ETDEWEB)

    Monje, Sascha; Corbella, Carles, E-mail: carles.corbella@rub.de; Keudell, Achim von [Research Group Reactive Plasmas, Ruhr-University Bochum, Universitystr. 150, 44801 Bochum (Germany)

    2015-10-07

    The elementary surface processes occurring on chromium targets exposed to reactive plasmas have been mimicked in beam experiments by using quantified fluxes of Ar ions (400–800 eV) and oxygen atoms and molecules. For this, quartz crystal microbalances were previously coated with Cr thin films by means of high-power pulsed magnetron sputtering. The measured growth and etching rates were fitted by flux balance equations, which provided sputter yields of around 0.05 for the compound phase and a sticking coefficient of O{sub 2} of 0.38 on the bare Cr surface. Further fitted parameters were the oxygen implantation efficiency and the density of oxidation sites at the surface. The increase in site density with a factor 4 at early phases of reactive sputtering is identified as a relevant mechanism of Cr oxidation. This ion-enhanced oxygen uptake can be attributed to Cr surface roughening and knock-on implantation of oxygen atoms deeper into the target. This work, besides providing fundamental data to control oxidation state of Cr targets, shows that the extended Berg's model constitutes a robust set of rate equations suitable to describe reactive magnetron sputtering of metals.

  3. Full System Model of Magnetron Sputter Chamber - Proof-of-Principle Study

    Energy Technology Data Exchange (ETDEWEB)

    Walton, C; Gilmer, G; Zepeda-Ruiz, L; Wemhoff, A; Barbee, T

    2007-05-04

    The lack of detailed knowledge of internal process conditions remains a key challenge in magnetron sputtering, both for chamber design and for process development. Fundamental information such as the pressure and temperature distribution of the sputter gas, and the energies and arrival angles of the sputtered atoms and other energetic species is often missing, or is only estimated from general formulas. However, open-source or low-cost tools are available for modeling most steps of the sputter process, which can give more accurate and complete data than textbook estimates, using only desktop computations. To get a better understanding of magnetron sputtering, we have collected existing models for the 5 major process steps: the input and distribution of the neutral background gas using Direct Simulation Monte Carlo (DSMC), dynamics of the plasma using Particle In Cell-Monte Carlo Collision (PIC-MCC), impact of ions on the target using molecular dynamics (MD), transport of sputtered atoms to the substrate using DSMC, and growth of the film using hybrid Kinetic Monte Carlo (KMC) and MD methods. Models have been tested against experimental measurements. For example, gas rarefaction as observed by Rossnagel and others has been reproduced, and it is associated with a local pressure increase of {approx}50% which may strongly influence film properties such as stress. Results on energies and arrival angles of sputtered atoms and reflected gas neutrals are applied to the Kinetic Monte Carlo simulation of film growth. Model results and applications to growth of dense Cu and Be films are presented.

  4. Sputtering deposition and characterization of ultrathin amorphous carbon films

    Science.gov (United States)

    Lu, Wei

    1999-11-01

    This dissertation focuses on experimental investigations of ultrathin, ultrasmooth amorphous carbon (a-C) films deposited on Si(100) substrates by radio frequency (RF) sputtering and characterization of the nanomechanical and nanotribological properties and thermal stability of the films. Ultrathin a-C films of thickness 5--100 nm and typical root-mean-square roughness of 0.15--1 nm were deposited on ultrasmooth Si(100) substrates using pure argon as the sputtering gas. A low-pressure RF argon discharge model was used to analyze the plasma parameters in the film growth environment. These plasma parameters correlate the deposition conditions with the film growth processes. Atomic force microscopy (AFM) and surface force microscopy (SFM) were used to characterize the nanomechanical and nanotribological properties of the a-C films. X-ray photoelectron spectroscopy (XPS) was used to investigate the compositions and microstructures of the films. Sputter-etching measurements of the a-C films by energetic argon ion bombardment were used to study the surface binding energy of carbon atoms in a-C films deposited under different conditions. The dependence of film properties on deposition conditions was studied, and relations between nanomechanical and nanotribological properties were discussed in terms of a modified deformation index. The deformation and nanotribology mechanisms of the a-C films were compared with those of other films, such as TiC and Cr films (both 100 nm thick), and bulk Si(100). Reactive RF sputtering of nitrogenated amorphous carbon (a-CNx) films was investigated by introducing nitrogen into the a-C films during film growth by using an argon-nitrogen gas mixture as the sputtering gas. The alloying effect of nitrogen on the film growth and properties, such as hardness and surface energy, was studied and interpreted in terms of the changes in the plasma environment induced due to differences in the composition of the sputtering gas mixture. The thermal

  5. 3D-modeling of Callisto's sputtered surface-exosphere environment

    Science.gov (United States)

    Lammer, Helmut; Pfleger, Martin; Lindqvist, Jesper; Lichtenegger, Herbert; Holmström, Mats; Vorburger, Audrey; Wurz, Peter; Barabash, Stas

    2016-04-01

    We study the stoichiometrical release of various surface elements caused by plasma sputtering from an assumed icy and non-icy (i.e., chondritic) surface into the exosphere of the Jovian satellite Callisto. We apply a 3D plasma planetary interaction hybrid model that is used for the evaluation of precipitation maps of magnetospheric H+, O+ and S+ sputter agents onto Callisto's surface. The obtained precipitation maps are then applied to the assumed surface compositions where the related sputter yields are calculated by means of the 2013 SRIM code and are coupled with a 3D exosphere model. Sputtered surface particles are followed on their individual trajectories until they either escape Callisto's gravitational attraction or return to the surface. We study also the effect of collisions between sputter species and ambient O2 molecules which form a tiny atmosphere near the satellite's surface and compare the exosphere densities that are obtained from the 3D model with and without a background gaseous envelope with recent 1D model results. Finally we discuss if the Neutral gas and Ion Mass (NIM) spectrometer, that is part of the Particle Environment Package (PEP) on board of the JUICE mission will be able to detect sputtered particles from Callisto's icy and non-icy surface.

  6. Are the argon metastables important in high power impulse magnetron sputtering discharges?

    Energy Technology Data Exchange (ETDEWEB)

    Gudmundsson, J. T., E-mail: tumi@hi.is [Department of Space and Plasma Physics, School of Electrical Engineering, KTH Royal Institute of Technology, SE-100 44 Stockholm (Sweden); Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik (Iceland); Lundin, D.; Minea, T. M. [Laboratoire de Physique des Gaz et Plasmas - LPGP, UMR 8578 CNRS, Université Paris-Sud, 91405 Orsay Cedex (France); Stancu, G. D. [CentraleSupélec, Grande Voie des Vignes, 92295 Chatenay-Malabry Cedex (France); CNRS, UPR 288 Laboratoire EM2C, Grande Voie des Vignes, 92295 Chatenay-Malabry Cedex (France); Brenning, N. [Department of Space and Plasma Physics, School of Electrical Engineering, KTH Royal Institute of Technology, SE-100 44 Stockholm (Sweden); Plasma and Coatings Physics Division, IFM-Materials Physics, Linköping University, SE-581 83 Linköping (Sweden)

    2015-11-15

    We use an ionization region model to explore the ionization processes in the high power impulse magnetron sputtering (HiPIMS) discharge in argon with a titanium target. In conventional dc magnetron sputtering (dcMS), stepwise ionization can be an important route for ionization of the argon gas. However, in the HiPIMS discharge stepwise ionization is found to be negligible during the breakdown phase of the HiPIMS pulse and becomes significant (but never dominating) only later in the pulse. For the sputtered species, Penning ionization can be a significant ionization mechanism in the dcMS discharges, while in the HiPIMS discharge Penning ionization is always negligible as compared to electron impact ionization. The main reasons for these differences are a higher plasma density in the HiPIMS discharge, and a higher electron temperature. Furthermore, we explore the ionization fraction and the ionized flux fraction of the sputtered vapor and compare with recent experimental work.

  7. Surface charging of thick porous water ice layers relevant for ion sputtering experiments

    Science.gov (United States)

    Galli, A.; Vorburger, A.; Pommerol, A.; Wurz, P.; Jost, B.; Poch, O.; Brouet, Y.; Tulej, M.; Thomas, N.

    2016-07-01

    We use a laboratory facility to study the sputtering properties of centimeter-thick porous water ice subjected to the bombardment of ions and electrons to better understand the formation of exospheres of the icy moons of Jupiter. Our ice samples are as similar as possible to the expected moon surfaces but surface charging of the samples during ion irradiation may distort the experimental results. We therefore monitor the time scales for charging and discharging of the samples when subjected to a beam of ions. These experiments allow us to derive an electric conductivity of deep porous ice layers. The results imply that electron irradiation and sputtering play a non-negligible role for certain plasma conditions at the icy moons of Jupiter. The observed ion sputtering yields from our ice samples are similar to previous experiments where compact ice films were sputtered off a micro-balance.

  8. Electronic sputtering of vitreous SiO{sub 2}: Experimental and modeling results

    Energy Technology Data Exchange (ETDEWEB)

    Toulemonde, M., E-mail: toulemonde@ganil.fr [CIMAP (ENSICAEN, CEA, CNRS, Univ. Caen), Bd H. Becquerel, 14070 Caen (France); Assmann, W. [Fakultät für Physik, Ludwig-Maximilians-Universität München, Am Coulombwall 1, 85748 Garching (Germany); Trautmann, C. [GSI Helmholzzentrum, Planckstr. 1, 64291 Darmstadt (Germany); Technische Universität Darmstadt, Alarich-Weiss-Straße 2, 64287 Darmstadt (Germany)

    2016-07-15

    The irradiation of solids with swift heavy ions leads to pronounced surface and bulk effects controlled by the electronic energy loss of the projectiles. In contrast to the formation of ion tracks in bulk materials, the concomitant emission of atoms from the surface is much less investigated. Sputtering experiments with different ions ({sup 58}Ni, {sup 127}I and {sup 197}Au) at energies around 1.2 MeV/u were performed on vitreous SiO{sub 2} (a-SiO{sub 2}) in order to quantify the emission rates and compare them with data for crystalline SiO{sub 2} quartz. Stoichiometry of the sputtering process was verified by monitoring the thickness decreases of a thin SiO{sub 2} film deposited on a Si substrate. Angular distributions of the emitted atoms were measured by collecting sputtered atoms on arc-shaped Cu catcher foils. Subsequent analysis of the number of Si atoms deposited on the catcher foils was quantified by elastic recoil detection analysis providing differential as well as total sputtering yields. Compared to existing data for crystalline SiO{sub 2}, the total sputtering yields for vitreous SiO{sub 2} are by a factor of about five larger. Differences in the sputtering rate and track formation characteristics between amorphous and crystalline SiO{sub 2} are discussed within the frame of the inelastic thermal spike model.

  9. Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Corbella, Carles; Grosse-Kreul, Simon; Kreiter, Oliver; Arcos, Teresa de los; Benedikt, Jan; Keudell, Achim von [RD Plasmas with Complex Interactions, Ruhr-Universität Bochum, Universitätsstr. 150, 44780 Bochum (Germany)

    2013-10-15

    A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions in reactive sputtering applications. Atom and ion sources are focused onto the sample to expose it to quantified beams of oxygen, nitrogen, hydrogen, noble gas ions, and metal vapor. The heterogeneous surface processes are monitored in situ by means of a quartz crystal microbalance and Fourier transform infrared spectroscopy. Two examples illustrate the capabilities of the particle beam setup: oxidation and nitriding of aluminum as a model of target poisoning during reactive magnetron sputtering, and plasma pre-treatment of polymers (PET, PP)

  10. Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces.

    Science.gov (United States)

    Corbella, Carles; Grosse-Kreul, Simon; Kreiter, Oliver; de los Arcos, Teresa; Benedikt, Jan; von Keudell, Achim

    2013-10-01

    A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions in reactive sputtering applications. Atom and ion sources are focused onto the sample to expose it to quantified beams of oxygen, nitrogen, hydrogen, noble gas ions, and metal vapor. The heterogeneous surface processes are monitored in situ by means of a quartz crystal microbalance and Fourier transform infrared spectroscopy. Two examples illustrate the capabilities of the particle beam setup: oxidation and nitriding of aluminum as a model of target poisoning during reactive magnetron sputtering, and plasma pre-treatment of polymers (PET, PP).

  11. Modeling target erosion during reactive sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Strijckmans, K., E-mail: Koen.Strijckmans@ugent.be; Depla, D.

    2015-03-15

    Highlights: • The erosion of a target is simulated with the RSD2013 software during reactive magnetron sputtering. • The influence of redeposition on the target state and on the hysteresis is explained. • The racetrack formation along the hysteresis and as function of the redeposition is quantified. • Comparison of the racetrack and the sputter profile shows clear differences. - Abstract: The influence of the reactive sputter conditions on the racetrack and the sputter profile for an Al/O{sub 2} DC reactive sputter system is studied by modeling. The role of redeposition, i.e. the deposition of sputtered material back on the target, is therefore taken into account. The used model RSD2013 is capable of simulating the effect of redeposition on the target condition in a spatial resolved way. Comparison between including and excluding redeposition in the RSD2013 model shows that the in-depth oxidation profile of the target differs. Modeling shows that it is important to distinguish between the formed racetrack, i.e. the erosion depth profile, and the sputter profile. The latter defines the distribution of the sputtered atoms in the vacuum chamber. As the target condition defines the sputter yield, it does determine the racetrack and the sputter profile of the planar circular target. Both the shape of the racetrack and the sputter profile change as function of the redeposition fraction as well as function of the oxygen flow change. Clear asymmetries and narrowing are observed for the racetrack shape. Similar effects are noticed for the sputter profile but to a different extent. Based on this study, the often heard misconception that the racetrack shape defines the distribution of the sputtered atoms during reactive sputtering is proven to be wrong.

  12. Solar Wind Sputtering of Lunar Soil Analogs: The Effect of Ionic Charge and Mass

    Science.gov (United States)

    Hijazi, H.; Bannister, M. E.; Meyer, F. W.; Rouleau, C. M.; Barghouty, A. F.; Rickman, D. L.; Hijazi, H.

    2014-01-01

    In this contribution we report sput-tering measurements of anorthite, an analog material representative of the lunar highlands, by singly and multicharged ions representative of the solar wind. The ions investigated include protons, as well as singly and multicharged Ar ions (as proxies for the heavier solar wind constituents), in the charge state range +1 to +9, and had a fixed solar-wind-relevant impact velocity of approximately 310 km/s or 500 eV/ amu. The goal of the measurements was to determine the sputtering contribution of the heavy, multicharged minority solar wind constituents in comparison to that due to the dominant H+ fraction.

  13. On the use of the double floating probe method to infer the difference between the electron and the heavy particles temperatures in an atmospheric pressure, vortex-stabilized nitrogen plasma jet

    Energy Technology Data Exchange (ETDEWEB)

    Prevosto, L., E-mail: prevosto@waycom.com.ar; Mancinelli, B. R. [Grupo de Descargas Eléctricas, Departamento Ingeniería Electromecánica, Facultad Regional Venado Tuerto (UTN), Laprida 651, 2600 Venado Tuerto, Santa Fe (Argentina); Kelly, H. [Grupo de Descargas Eléctricas, Departamento Ingeniería Electromecánica, Facultad Regional Venado Tuerto (UTN), Laprida 651, 2600 Venado Tuerto, Santa Fe (Argentina); Instituto de Física del Plasma (CONICET), Departamento de Física, Facultad de Ciencias Exactas y Naturales (UBA) Ciudad Universitaria Pab. I, 1428 Buenos Aires (Argentina)

    2014-05-15

    Sweeping double probe measurements in an atmospheric pressure direct current vortex-stabilized plasma jet are reported (plasma conditions: 100 A discharge current, N{sub 2} gas flow rate of 25 Nl/min, thoriated tungsten rod-type cathode, copper anode with 5 mm inner diameter). The interpretation of the double probe characteristic was based on a generalization of the standard double floating probe formulae for non-uniform plasmas coupled to a non-equilibrium plasma composition model. Perturbations caused by the current to the probe together with collisional and thermal processes inside the probe perturbed region were taken into account. Radial values of the average electron and heavy particle temperatures as well as the electron density were obtained. The calculation of the temperature values did not require any specific assumption about a temperature relationship between different particle species. An electron temperature of 10 900 ± 900 K, a heavy particle temperature of 9300 ± 900 K, and an electron density of about 3.5 × 10{sup 22} m{sup −3} were found at the jet centre at 3.5 mm downstream from the torch exit. Large deviations from kinetic equilibrium were found toward the outer border of the plasma jet. These results showed good agreement with those previously reported by the authors by using a single probe technique. The calculations have shown that this method is particularly useful for studying spraying-type plasma torches operated at power levels of about 15 kW.

  14. On the use of the double floating probe method to infer the difference between the electron and the heavy particles temperatures in an atmospheric pressure, vortex-stabilized nitrogen plasma jet.

    Science.gov (United States)

    Prevosto, L; Kelly, H; Mancinelli, B R

    2014-05-01

    Sweeping double probe measurements in an atmospheric pressure direct current vortex-stabilized plasma jet are reported (plasma conditions: 100 A discharge current, N2 gas flow rate of 25 Nl/min, thoriated tungsten rod-type cathode, copper anode with 5 mm inner diameter). The interpretation of the double probe characteristic was based on a generalization of the standard double floating probe formulae for non-uniform plasmas coupled to a non-equilibrium plasma composition model. Perturbations caused by the current to the probe together with collisional and thermal processes inside the probe perturbed region were taken into account. Radial values of the average electron and heavy particle temperatures as well as the electron density were obtained. The calculation of the temperature values did not require any specific assumption about a temperature relationship between different particle species. An electron temperature of 10,900 ± 900 K, a heavy particle temperature of 9300 ± 900 K, and an electron density of about 3.5 × 10(22) m(-3) were found at the jet centre at 3.5 mm downstream from the torch exit. Large deviations from kinetic equilibrium were found toward the outer border of the plasma jet. These results showed good agreement with those previously reported by the authors by using a single probe technique. The calculations have shown that this method is particularly useful for studying spraying-type plasma torches operated at power levels of about 15 kW.

  15. In-situ sputtering apparatus

    Science.gov (United States)

    Erickson, Mark R.; Poole, Henry J.; Custer, III, Arthur W.; Hershcovitch, Ady

    2015-06-09

    A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

  16. Metal plasmas for the fabrication of nanostructures

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2006-09-21

    A review is provided covering metal plasma production, theenergetic condensation of metal plasmas, and the formation ofnanostructures using such plasmas. Plasma production techniques includepulsed laser ablation, filtered cathodic arcs, and various forms ofionized physical vapor deposition, namely magnetron sputtering withionization of sputtered atoms in radio frequency discharges,self-sputtering, and high power impulse magnetron sputtering. Thediscussion of energetic condensation focuses on the control of kineticenergy by biasing and also includes considerations of the potentialenergy and the processes occurring at subplantation and implantation. Inthe final section on nanostructures, two different approaches arediscussed. In the top-down approach, the primary nanostructures arelithographically produced and metal plasma is used to coat or filltrenches and vias. Additionally, multilayers with nanosize periods(nanolaminates) can be produced. In the bottom-up approach, thermodynamicforces are used to fabricate nanocomposites and nanoporous materials bydecomposition and dealloying.

  17. On the hadron production from the quark-gluon plasma phase in ultra-relativistic heavy-ion collisions

    CERN Document Server

    Berdnikov, Yu A; Ivanov, A N; Ivanova, V A; Kosmach, V F; Samsonov, V M; Troitskaya, N I; Berdnikov, Ya. A.

    2000-01-01

    We describe the quark gluon plasma (QGP) as a thermalized quark-gluon system, the thermalized QGP phase of QCD. The hadronization of the thermalized QGP phase is given in a way resembling a simple coalescence model. The input parameters of the approach are the spatial volumes of the hadronization. We introduce three dimensionless parameters C_M, C_B and C_\\bar{B} related to the spatial volumes of the production of low-lying mesons (M), baryons (B) and antibaryons (\\bar{B}). We show that at the temperature T= 175 MeV our predictions for the ratios of multiplicities agree good with the presently available set of hadron ratios measured for various experiments given by NA44, NA49, NA50 and WA97 Collaborations on Pb+Pb collisions at 158 GeV/nucleon, NA35 Collaboration on S+S collisions and NA38 Collaboration on O+U and S+U collisions at 200 GeV/nucleon.

  18. Ion sputtered deposit analysis by electron microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Lundquist, T.R.; Kraus, B.; Swann, P.R. (GATAN, Inc., Warrendale, PA (USA))

    1983-12-15

    The collected deposit formed by sputtering a specimen provides a permanent record of the elemental surface composition. For analysis by X-rays or energy loss in a transmission electron microscope, all the sputtered particles (both ions and neutrals) are collected on a carbon or SiO thin film. Surface analysis can be obtained by exposing different areas of the specimen to the ion beam. Information available in the angular distributions of sputtered particles is retained on the thin film substrate. Depth profiling can be performed by the sequential exposure of different areas of the thin film substrate to the sputtered specimen particles. Examples from stainless steels and silicon compounds are given. The advantage of this ion sputtered deposit analysis (ISDA) technique, apart from its collection efficiency, is its ability to store permanently all the elemental information obtained from a particular experiment. This information can then be processed in a parallel or serial fashion at any time after the sputtering experiment.

  19. Collision-spike Sputtering of Au Nanoparticles.

    Science.gov (United States)

    Sandoval, Luis; Urbassek, Herbert M

    2015-12-01

    Ion irradiation of nanoparticles leads to enhanced sputter yields if the nanoparticle size is of the order of the ion penetration depth. While this feature is reasonably well understood for collision-cascade sputtering, we explore it in the regime of collision-spike sputtering using molecular-dynamics simulation. For the particular case of 200-keV Xe bombardment of Au particles, we show that collision spikes lead to abundant sputtering with an average yield of 397 ± 121 atoms compared to only 116 ± 48 atoms for a bulk Au target. Only around 31 % of the impact energy remains in the nanoparticles after impact; the remainder is transported away by the transmitted projectile and the ejecta. The sputter yield of supported nanoparticles is estimated to be around 80 % of that of free nanoparticles due to the suppression of forward sputtering.

  20. Fabricating fine-grained tungsten heavy alloy by spark plasma sintering of low-energy ball-milled W–2Mo–7Ni–3Fe powders

    Energy Technology Data Exchange (ETDEWEB)

    Xiang, D.P., E-mail: dpxiang@hainu.edu.cn [Key Laboratory of Advanced Materials of Tropical Island Resources, Ministry of Education, Hainan University, Haikou 570228 (China); School of Mechanical and Automotive Engineering, South China University of Technology, Guangzhou 510640 (China); Ding, L. [Key Laboratory of Advanced Materials of Tropical Island Resources, Ministry of Education, Hainan University, Haikou 570228 (China); Li, Y.Y. [School of Mechanical and Automotive Engineering, South China University of Technology, Guangzhou 510640 (China); Chen, X.Y.; Zhang, T.M. [Key Laboratory of Advanced Materials of Tropical Island Resources, Ministry of Education, Hainan University, Haikou 570228 (China)

    2013-08-20

    Fine-grained W–2Mo–7Ni–3Fe heavy alloys were fabricated by low-energy ball milling (LEBM)-assisted spark plasma sintering at a temperature range of 1000–1250 °C. The effects of sintering temperature on the phase evolution, microstructural characteristics, and mechanical properties of the alloys were studied by X-ray diffraction (XRD), scanning electron microscopy (SEM), hardness testing, and universal testing. The XRD results show that small intermetallic compounds, such as NiW and Ni{sub 2}W{sub 4}C, form in the alloys. The W–2Mo–7Ni–3Fe alloys are characterized by white W grains, a gray W-rich microstructure that contains Mo, and a black γ–(Ni, Fe, W, Mo) binding phase. The X-ray energy dispersive analysis (EDS) shows that the Mo, Ni, and Fe that form a solid solution with W in the gray structure gradually decrease with increasing temperature. The hardness and bending strength of the alloys initially increase and then decrease with rising sintering temperature. Moreover, the alloys sintered at different temperatures exhibit dissimilar bending fracture modes.

  1. Diagnosis of high-intensity pulsed heavy ion beam generated by a novel magnetically insulated diode with gas puff plasma gun.

    Science.gov (United States)

    Ito, H; Miyake, H; Masugata, K

    2008-10-01

    Intense pulsed heavy ion beam is expected to be applied to materials processing including surface modification and ion implantation. For those applications, it is very important to generate high-purity ion beams with various ion species. For this purpose, we have developed a new type of a magnetically insulated ion diode with an active ion source of a gas puff plasma gun. When the ion diode was operated at a diode voltage of about 190 kV, a diode current of about 15 kA, and a pulse duration of about 100 ns, the ion beam with an ion current density of 54 A/cm(2) was obtained at 50 mm downstream from the anode. By evaluating the ion species and the energy spectrum of the ion beam via a Thomson parabola spectrometer, it was confirmed that the ion beam consists of nitrogen ions (N(+) and N(2+)) of energy of 100-400 keV and the proton impurities of energy of 90-200 keV. The purity of the beam was evaluated to be 94%. The high-purity pulsed nitrogen ion beam was successfully obtained by the developed ion diode system.

  2. Epitaxial Growth of Rhenium with Sputtering

    Science.gov (United States)

    2016-05-06

    match (a = 2.76 Å) to the oxygen sublattice (a = 2.77 Å) of α-Al2O3 (0001) [2]. Re also has a reasonably high superconducting critical temperature...to copyright. Keywords: Epitaxy, Rhenium, Sputtering 1. Introduction Epitaxial superconducting films of refractory metals are a promising new...than the RF sputtered films. These differences are most likely due to the fact that RF sputtering has more of an etching effect on the sample

  3. Magnetron reactively sputtered Ti-DLC coatings on HNBR rubber : The influence of substrate bias

    NARCIS (Netherlands)

    Bui, X.L.; Pei, Y.T.; Hosson, J.Th.M. De

    2008-01-01

    In this study, Ti-containing diamond-like carbon (Ti-DLC) coatings have been deposited on HNBR (hydrogenated nitrile butadiene) rubber and also on Si wafer as reference via unbalanced magnetroli reactive sputtering from a Ti target in C2H2/Ar plasma. The deposition rates of coatings on rubber and Si

  4. Heavy Quarks and Heavy Quarkonia as Tests of Thermalization

    CERN Document Server

    Nagle, J L

    2006-01-01

    We present here a brief summary of new results on heavy quarks and heavy quarkonia from the PHENIX experiment as presented at the "Quark Gluon Plasma Thermalization" Workshop in Vienna, Austria in August 2005, directly following the International Quark Matter Conference in Hungary.

  5. Characterization of high power impulse magnetron sputtering discharges

    Science.gov (United States)

    Hala, Matej

    Paper I: In the first paper, we present a new approach in the characterization of the high power pulsed magnetron sputtering (HiPIMS) discharge evolution—time- and species-resolved plasma imaging—employing a set of band-pass optical interference filters suitable for the isolation of the emission originating from different species populating the plasma. We demonstrate that the introduction of such filters can be used to distinguish different phases of the discharge, and to visualize numerous plasma effects including background gas excitations during the discharge ignition, gas shock waves, and expansion of metal-rich plasmas. In particular, the application of this technique is shown on the diagnostics of the 200 µs long non-reactive HiPIMS discharges using a Cr target. Paper II: In order to gain further information about the dynamics of reactive HiPIMS discharges, both fast plasma imaging and time- and space-resolved optical emission spectroscopy (OES) are used for a systematic investigation of the 200 µs long HiPIMS pulses operated in Ar, N2 and N 2/Ar mixtures and at various pressures. It is observed that the dense metal plasma created next to the target propagates in the reactor at a speed ranging from 0.7 to 3.5 km s-1, depending on the working gas composition and the pressure. In fact, it increases with higher N 2 concentration and with lower pressure. The visible form of the propagating plasma wave changes from a hemispherical shape in Ar to a drop-like shape extending far from the target with increasing N2 concentration, owing to the significant emission from molecular N2. Interestingly, the evidence of the target self-sputtering is found for all investigated conditions, including pure N2 atmosphere. Paper III: Here, we report on the time- and species-resolved plasma imaging analysis of the dynamics of the 200 µs long HiPIMS discharges above a Cr target ignited in pure O2. It is shown that the discharge emission is dominated solely by neutral and

  6. Optical Characterization of Porous Sputtered Silver Thin Films

    Directory of Open Access Journals (Sweden)

    Olivier Carton

    2013-01-01

    Full Text Available The optical properties of various porous silver films, grown with a commercial DC sputter coater, were investigated and compared for different plasma parameters. Effective Drude models were successfully used for those films whose spectra did not show particular resonance peaks. For the other films, neither an effective Drude model nor effective medium models (Maxwell Garnett, Bruggeman, and Looyenga can describe the optical properties. It turns out that a more general approach like the Bergman representation describes the optical data of these films accurately adopting porosity values consistent with physical measurements.

  7. Serial co-sputtering. Development of a versatile coating technology and its characterization using the example of rate enhancement of metal oxides by co-doping; Serielles Co-Sputtern. Entwicklung einer flexiblen Beschichtungstechnologie und deren Charakterisierung am Beispiel der Ratenerhoehung von Metalloxiden durch Co-Dotierung

    Energy Technology Data Exchange (ETDEWEB)

    Austgen, Michael

    2011-09-19

    Focus of this work is the design and characterization of a versatile coating system based on magnetron sputter deposition. This technology consists of a rotary target (primary target) that will be sputtered at one position and also can be coated at a different position with a secondary material by another sputter process. This simultaneous operation and the serial order of two sputter processes is the serial co-sputter process. A highly elaborated gas separation allows the operation of the primary sputter process in a reactive gas atmosphere whereas the secondary process can be driven in a non-reactive atmosphere. Compared to conventional co-sputtering the gas separation enables a stable operation of the secondary sputter process even if reactive gas is added to the primary sputter process. To develop an understanding of the process dynamics of serial co-sputtering the rate enhancement of metal oxides by co-doping with heavy atoms has been investigated first. If heavy elements are added to the target material the collision cascades can be reflected back towards the target surface by a more efficient momentum transfer and therefore increase the sputtering rate. The addition of heavy atoms can be achieved by serial co-sputtering. In the secondary sputter process the heavy element will be sputter deposited onto the rotary target. When entering the erosion zone of the primary sputter process the heavy atoms will be partially sputtered away and partially recoil implanted beneath the target surface. The later will contribute to the sputter yield amplification effect described above. In this work the sputter yield amplification effect has been investigated for the metal oxides Al{sub 2}O{sub 3} and TiO{sub 2} by co-doping of a aluminum and titanium rotary target with the heavy element tungsten (Z=74) and bismuth (Z=83). The primary process variables are the O{sub 2}-gas flow which determines the working point of the primary sputtering process, the rotation speed of the

  8. RF sputtering: A viable tool for MEMS fabrication

    Indian Academy of Sciences (India)

    Sudhir Chandra; Vivekanand Bhatt; Ravindra Singh

    2009-08-01

    Fabrication of Micro-Electro-Mechanical-Systems (MEMS) requires deposition of films such as SiO2, Si34, ZnO, polysilicon, phosphosilicate glass (PSG), Al, Cr-Au, Pt, etc. for use as structural, sacrificial, piezoelectric and conducting material. Deposition of these materials at low temperature is desirable for fabricating sensors/actuators on temperature-sensitive substrates and also for integrating MEMS structures on silicon in post-CMOS processing procedures. Plasma enhanced chemical vapour deposition (PECVD) and sputtering are amongst potential techniques for preparing films for MEMS fabrication at comparatively low temperatures. The sputtering technique has an added advantage that the process is carried out in an inert ambient (argon) and chemically sensitive substrate/sacrificial layers can be used in realization of MEMS. Furthermore, the same system can be used for depositing dielectric, piezoelectric and conducting materials as per requirement in the fabrication sequence. This enables rapid low-cost prototyping of MEMS with minimum fabrication facilities. In the present work, we report preparation, characterization and application of RF sputtered SiO2, Si34 and ZnO films for MEMS fabrication. The effect of RF power, sputtering pressure and target-to-substrate spacing was investigated on the structural and other properties of the films. The residual stress in the films was obtained using wafer curvature measurement technique. The deposition parameters are optimized to obtain low stress films of SiO2 and Si34. The self-heating of the substrate during deposition was advantageously exploited to obtain highly -axis oriented films of ZnO without any external heating. A variety of MEMS structures such as cantilever beams, micro-bridges, diaphragms, etc. are demonstrated using bulk, surface and surface-bulk micromachining techniques.

  9. Heavy ion irradiation of crystalline water ice

    CERN Document Server

    Dartois, E; Boduch, P; Brunetto, R; Chabot, M; Domaracka, A; Ding, J J; Kamalou, O; Lv, X Y; Rothard, H; da Silveira, E F; Thomas, J C

    2015-01-01

    Under cosmic irradiation, the interstellar water ice mantles evolve towards a compact amorphous state. Crystalline ice amorphisation was previously monitored mainly in the keV to hundreds of keV ion energies. We experimentally investigate heavy ion irradiation amorphisation of crystalline ice, at high energies closer to true cosmic rays, and explore the water-ice sputtering yield. We irradiated thin crystalline ice films with MeV to GeV swift ion beams, produced at the GANIL accelerator. The ice infrared spectral evolution as a function of fluence is monitored with in-situ infrared spectroscopy (induced amorphisation of the initial crystalline state into a compact amorphous phase). The crystalline ice amorphisation cross-section is measured in the high electronic stopping-power range for different temperatures. At large fluence, the ice sputtering is measured on the infrared spectra, and the fitted sputtering-yield dependence, combined with previous measurements, is quadratic over three decades of electronic ...

  10. Low yield sputtering of monocrystalline metals

    NARCIS (Netherlands)

    Veen, A. van; Fluit, J.M.

    1980-01-01

    Sputtering of monocrystalline metals by light noble gas ions is studied experimentally and theoretically at low primary ion energy. Evidence is found for a multiple collision process in which surface atoms are sputtered by backscattered ions. The introduction of the maximum recoil energy EM in the s

  11. Preparation of fine-grained tungsten heavy alloys by spark plasma sintered W–7Ni–3Fe composite powders with different ball milling time

    Energy Technology Data Exchange (ETDEWEB)

    Xiang, D.P., E-mail: dpxiang@hainu.edu.cn [Key Laboratory of Advanced Materials of Tropical Island Resources, Ministry of Education, Hainan University, Haikou 570228 (China); School of Mechanical and Automotive Engineering, South China University of Technology, Guangzhou 510640 (China); Ding, L. [Key Laboratory of Advanced Materials of Tropical Island Resources, Ministry of Education, Hainan University, Haikou 570228 (China); Li, Y.Y.; Chen, G.B. [School of Mechanical and Automotive Engineering, South China University of Technology, Guangzhou 510640 (China); Zhao, Y.W. [Key Laboratory of Advanced Materials of Tropical Island Resources, Ministry of Education, Hainan University, Haikou 570228 (China)

    2013-06-15

    Highlights: ► We fabricate fine-grained W–7Ni–3Fe alloys using HEBM assisted SPS method. ► The γ-(Ni, Fe, W) phase is not observed in HEBM raw powders. ► The density of the WHAs gradually decreased with increasing HEBM time. ► The hardness and bending strength of the WHAs show different trends of variation. ► The intergranular fracture was the main bending fracture mode of the WHAs. -- Abstract: The fine-grained tungsten heavy alloys (WHAs) with grain size of about 1–3 μm were successfully prepared by spark plasma sintered W–7Ni–3Fe composite powders with different high-energy ball milling (HEBM) time. This study analyzes the effects of HEBM time not only on the composite powders but on the microstructure and mechanical properties of WHAs. The scanning electron microscopy (SEM) and X-ray diffraction (XRD) were used to investigate the microstructure and phase evolution rules of powders and alloys, respectively. The γ-(Ni, Fe, W) is not observed in XRD patterns of the ball milled powders. With prolonging HEBM time, the W phase diffraction peak becomes increasingly wider, and its intensity continues to decline. However, the completely amorphous structures are not formed even after HEBM 40 h. The relative density of the WHAs prepared by HEBM assisted SPS technique decreases gradually with increasing the ball milling time. For the WHAs sintered in 1150 °C for 8 min, the W grains grow finer and the content of the γ-(Ni, Fe, W) binding phase greatly increases with prolonging the HEBM time. Meanwhile, over 5 h of HEBM time, the bending strength continuously decreases and the hardness slightly increases. The intergranular fracture of the W grains is the main bending fracture mode in all the WHAs. The microporous of different sizes are distributed on the bending fracture and progressively increased with prolonging the ball milling time.

  12. Confined ion beam sputtering device and method

    Science.gov (United States)

    Sharp, D.J.

    1986-03-25

    A hollow cylindrical target, lined internally with a sputter deposit material and open at both ends, surrounds a substrate on which sputtered deposition is to be obtained. An ion beam received through either one or both ends of the open cylindrical target is forced by a negative bias applied to the target to diverge so that ions impinge at acute angles at different points of the cylindrical target surface. The ion impingement results in a radially inward and downstream directed flux of sputter deposit particles that are received by the substrate. A positive bias applied to the substrate enhances divergence of the approaching ion beams to generate a higher sputtered deposition flux rate. Alternatively, a negative bias applied to the substrate induces the core portion of the ion beams to reach the substrate and provide ion polishing of the sputtered deposit thereon.

  13. Molecular anions sputtered from fluorides

    CERN Document Server

    Gnaser, H

    2002-01-01

    The emission of negatively charged ions from different fluoride samples (LiF, CaF sub 2 , LaF sub 3 and HfF sub 4) induced by sputtering with a 14.5-keV Cs sup + ion beam was studied. Sputtered ions were detected in a high-sensitivity double-focusing mass spectrometer. In particular, the possible existence of small doubly charged negative molecular ions was investigated. But whereas singly charged species of the general type MF sub n sup - (where M represents a metal atom) were detected with high abundances, stable dianions were observed in an unambiguous way only for one molecule: HfF sub 6 sup 2 sup -. The flight time through the mass spectrometer of approx 35 mu s establishes a lower limit with respect to the intrinsic lifetime of this doubly charged ion. For singly charged anions abundance distributions and, in selected cases, emission-energy spectra were recorded. For two ion species (Ca sup - and HfF sub 5 sup -) isotopic fractionation effects caused by the (velocity dependent) ionization process were d...

  14. Study of uranium dioxyde sputtering induced by multicharged heavy ions at low and very low kinetic energy: projectile charge effect; Etude de la pulverisation du dioxyde d'uranium induite par des ions lourds multicharges de basse et tres basse energie cinetique; effet de la charge du projectile

    Energy Technology Data Exchange (ETDEWEB)

    Haranger, F

    2003-12-01

    Ion beam irradiation of a solid can lead to the emission of neutral or ionized atoms, molecules or clusters from the surface. This comes as a result of the atomic motion in the vicinity of the surface, induced by the transfer of the projectile energy. Then, the study of the sputtering process appears as a means to get a better understanding of the excited matter state around the projectile trajectory. In the case of slow multicharged ions, a strong electronic excitation can be achieved by the projectile neutralization above the solid surface and / or its deexcitation below the surface. Parallel to this, the slowing down of such ions is essentially related to elastic collision with the target atoms. The study of the effect of the initial charge state of slow multicharged ions, in the sputtering process, has been carried out by measuring the absolute angular distributions of emission of uranium atoms from a uranium dioxide surface. The experiments have been performed in two steps. First, the emitted particles are collected onto a substrate during irradiation. Secondly, the surface of the collectors is analyzed by Rutherford Backscattering Spectrometry (RBS). This method allows the characterization of the emission of neutrals, which are the vast majority of the sputtered particles. The results obtained provide an access to the evolution of the sputtering process as a function of xenon projectile ions charge state. The measurements have been performed over a wide kinetic energy range, from 81 down to 1.5 keV. This allowed a clear separation of the contribution of the kinetic energy and initial projectile charge state to the sputtering phenomenon. (author)

  15. Rf sputtering of CdTE and CdS for thin film PV

    Energy Technology Data Exchange (ETDEWEB)

    Compaan, A.D.; Tabory, C.N.; Shao, M.; Fischer, A.; Feng, Z.; Bohn, R.G. (Department of Physics and Astronomy, University of Toledo, Toledo, Ohio 43606 (United States))

    1994-06-30

    In late 1992 we demonstrated the first rf sputtered CdS/CdTe photovoltaic cell with efficiency exceeding 10%. In this cell both CdS and CdTe layers were deposited by rf sputtering. In this paper we report preliminary measurements of (1) optical emission spectroscopy of the rf plasma, (2) the width of the phonon Raman line as a function of deposition temperature for CdS, and (3) studies of oxygen doping during pulsed laser deposition of CdTe.

  16. Comparative study of ITO and TiN fabricated by low-temperature RF biased sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Simon, Daniel K., E-mail: daniel.simon@namlab.com; Schenk, Tony; Dirnstorfer, Ingo; Fengler, Franz P. G.; Jordan, Paul M.; Krause, Andreas [NaMLab gGmbH, Nöthnitzerstr. 64, 01187 Dresden (Germany); Tröger, David [Westsächsische Hochschule Zwickau, Fachgruppe Nanotechnologie, Dr.-Friedrichs-Ring 2a, 08056 Zwickau (Germany); Mikolajick, Thomas [NaMLab gGmbH, Nöthnitzerstr. 64, 01187 Dresden, Germany and TU Dresden, Institut für Halbleiter- und Mikrosystemtechnik (IHM), 01062 Dresden (Germany)

    2016-03-15

    Radio frequency (RF) biasing induced by a second plasma source at the substrate is applied to low-temperature sputtering processes for indium tin oxide (ITO) and titanium nitride (TiN) thin films. Investigations on crystal structure and surface morphology show that RF-biased substrate plasma processes result in a changed growth regime with different grain sizes and orientations than those produced by processes without a substrate bias. The influence of the RF bias is shown comparatively for reactive RF-sputtered ITO and reactive direct-current-sputtered TiN. The ITO layers exhibit an improved electrical resistivity of 0.5 mΩ cm and an optical absorption coefficient of 0.5 × 10{sup 4 }cm{sup −1} without substrate heating. Room-temperature sputtered TiN layers are deposited that possess a resistivity (0.1 mΩ cm) of 3 orders of magnitude lower than, and a density (5.4 g/cm{sup 3}) up to 45% greater than, those obtained from layers grown using the standard process without a substrate plasma.

  17. Reactive sputtering of δ-ZrH{sub 2} thin films by high power impulse magnetron sputtering and direct current magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Högberg, Hans, E-mail: hans.hogberg@liu.se; Tengdelius, Lina; Eriksson, Fredrik; Broitman, Esteban; Lu, Jun; Jensen, Jens; Hultman, Lars [Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Samuelsson, Mattias [Impact Coatings AB, Westmansgatan 29, SE-582 16 Linköping (Sweden)

    2014-07-01

    Reactive sputtering by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) of a Zr target in Ar/H{sub 2} plasmas was employed to deposit Zr-H films on Si(100) substrates, and with H content up to 61 at. % and O contents typically below 0.2 at. % as determined by elastic recoil detection analysis. X-ray photoelectron spectroscopy reveals a chemical shift of ∼0.7 eV to higher binding energies for the Zr-H films compared to pure Zr films, consistent with a charge transfer from Zr to H in a zirconium hydride. X-ray diffraction shows that the films are single-phase δ-ZrH{sub 2} (CaF{sub 2} type structure) at H content >∼55 at. % and pole figure measurements give a 111 preferred orientation for these films. Scanning electron microscopy cross-section images show a glasslike microstructure for the HiPIMS films, while the DCMS films are columnar. Nanoindentation yield hardness values of 5.5–7 GPa for the δ-ZrH{sub 2} films that is slightly harder than the ∼5 GPa determined for Zr films and with coefficients of friction in the range of 0.12–0.18 to compare with the range of 0.4–0.6 obtained for Zr films. Wear resistance testing show that phase-pure δ-ZrH{sub 2} films deposited by HiPIMS exhibit up to 50 times lower wear rate compared to those containing a secondary Zr phase. Four-point probe measurements give resistivity values in the range of ∼100–120 μΩ cm for the δ-ZrH{sub 2} films, which is slightly higher compared to Zr films with values in the range 70–80 μΩ cm.

  18. Impact of sputter deposition parameters on molybdenum nitride thin film properties

    Science.gov (United States)

    Stöber, L.; Konrath, J. P.; Krivec, S.; Patocka, F.; Schwarz, S.; Bittner, A.; Schneider, M.; Schmid, U.

    2015-07-01

    Molybdenum and molybdenum nitride thin films are presented, which are deposited by reactive dc magnetron sputtering. The influence of deposition parameters, especially the amount of nitrogen during film synthesization, to mechanical and electrical properties is investigated. The crystallographic phase and lattice constants are determined by x-ray diffraction analyses. Further information on the microstructure as well as on the biaxial film stress are gained from techniques such as transmission electron microscopy, scanning electron microscopy and the wafer bow. Furthermore, the film resistivity and the temperature coefficient of resistance are measured by the van der Pauw technique starting from room temperature up to 300 °C. Independent of the investigated physical quantity, a dominant dependence on the sputtering gas nitrogen content is observed compared to other deposition parameters such as the plasma power or the sputtering gas pressure in the deposition chamber.

  19. Thermal spike model interpretation of sputtering yield data for Bi thin films irradiated by MeV {sup 84}Kr{sup 15+} ions

    Energy Technology Data Exchange (ETDEWEB)

    Mammeri, S. [Centre de Recherche Nucléaire d’Alger, B.P. 399, 02 Bd. Frantz Fanon, Alger-gare, Algiers (Algeria); Ouichaoui, S., E-mail: souichaoui@gmail.com [Université des Sciences et de la Technologie H. Boumediene (USTHB), Faculté de Physique, Laboratoire SNIRM, B.P. 32, El-Alia, 16111 Bab Ezzouar, Algiers (Algeria); Ammi, H. [Centre de Recherche Nucléaire d’Alger, B.P. 399, 02 Bd. Frantz Fanon, Alger-gare, Algiers (Algeria); Pineda-Vargas, C.A. [iThemba LABS, National Research Foundation, P.O. Box 722, Somerset West 7129 (South Africa); Faculty of Health and Wellness Sciences, CPUT, P.O. Box 1906, Bellville 7535 (South Africa); Dib, A. [Centre de Recherche Nucléaire d’Alger, B.P. 399, 02 Bd. Frantz Fanon, Alger-gare, Algiers (Algeria); Msimanga, M. [iThemba LABS, National Research Foundation, P. Bag 11, Wits 2050, Johannesburg (South Africa); Department of Physics, Tshwane University of Technology, P. Bag X680, Pretoria 001 (South Africa)

    2015-07-01

    A modified thermal spike model initially proposed to account for defect formation in metals within the high heavy ion energy regime is adapted for describing the sputtering of Bi thin films under MeV Kr ions. Surface temperature profiles for both the electronic and atomic subsystems have been carefully evaluated versus the radial distance and time with introducing appropriate values of the Bi target electronic stopping power for multi-charged Kr{sup 15+} heavy ions as well as different target physical proprieties like specific heats and thermal conductivities. Then, the total sputtering yields of the irradiated Bi thin films have been determined from a spatiotemporal integration of the local atomic evaporation rate. Besides, an expected non negligible contribution of elastic nuclear collisions to the Bi target sputtering yields and ion-induced surface effects has also been considered in our calculation. Finally, the latter thermal spike model allowed us to derive numerical sputtering yields in satisfactorily agreement with existing experimental data both over the low and high heavy ion energy regions, respectively, dominated by elastic nuclear collisions and inelastic electronic collisions, in particular with our data taken recently for Bi thin films irradiated by 27.5 MeV Kr{sup 15+} heavy ions. An overall consistency of our model calculation with the predictions of sputtering yield theoretical models within the target nuclear stopping power regime was also pointed out.

  20. Sputtering of Surfaces of the Solid Hydrogens

    DEFF Research Database (Denmark)

    Schou, Jørgen; Thestrup Nielsen, Birgitte; Svendsen, Winnie Edith;

    1998-01-01

    Sputtering of the solid hydrogens by electrons and ions exhibits features that may be related to quantum properties of these solids, i.e. a drastic enhancement of the yield for electron–bombarded thick deuterium films and a thermal peak at low ejection energies in the energy distribution of the s......Sputtering of the solid hydrogens by electrons and ions exhibits features that may be related to quantum properties of these solids, i.e. a drastic enhancement of the yield for electron–bombarded thick deuterium films and a thermal peak at low ejection energies in the energy distribution...... of the sputtered particles....

  1. Nanoscale growth twins in sputtered metal films

    Energy Technology Data Exchange (ETDEWEB)

    Misra, Amit [Los Alamos National Laboratory; Anderoglu, Osman [Los Alamos National Laboratory; Hoagland, Richard G [Los Alamos National Laboratory; Zhang, X [TEXAS A& M

    2008-01-01

    We review recent studies on the mechanical properties of sputtered Cu and 330 stainless steel films with {l_brace}1 1 1{r_brace} nanoscale growth twins preferentially oriented perpendicular to growth direction. The mechanisms of formation of growth twins during sputtering and the deformation mechanisms that enable usually high strengths in nanotwinned structures are highlighted. Growth twins in sputtered films possess good thermal stability at elevated temperature, providing an approach to extend the application of high strength nanostructured metals to higher temperatures.

  2. 14% sputtered thin-film solar cells based on CdTe

    Science.gov (United States)

    Compaan, A. D.; Gupta, A.; Drayton, J.; Lee, S.-H.; Wang, S.

    2004-02-01

    Polycrystalline II-VI semiconductor materials show great promise for thin-film photovoltaic cells and modules. Large-area deposition of these II-VI semiconductors such as CdTe is possible by a variety of methods but the use of a plasma-based method such as magnetron sputtering can have significant advantages. Here we present recent results in the fabrication of CdS/CdTe cells using rf magnetron sputtering and discuss some of the advantages that appear possible from the use of sputtering methods in this class of materials. Some of these advantages are particularly relevant as the polycrystalline thin-film PV community addresses issues related to the challenges of fabricating high efficiency tandem cells with efficiencies over 25%. Our best results have been obtained with sputtered ZnO:Al to achieve a CdTe solar cell with 14.0% efficiency at one sun for an air-mass-1.5 global spectrum. In addition, we have studied reactive sputtering of ZnTe:N which shows promise for use as a transparent back contact or recombination junction for alloyed II-VI-based top cells in a tandem solar-cell configuration.

  3. Deposition of Aluminium Oxide Films by Pulsed Reactive Sputtering

    Institute of Scientific and Technical Information of China (English)

    Xinhui MAO; Bingchu CAI; Maosong WU; Guoping CHEN

    2003-01-01

    Pulsed reactive sputtering is a novel process used to deposit some compound films, which are not deposited by traditional D.C. reactive sputtering easily. In this paper some experimental results about the deposition of Al oxide films by pulsed reactive sputtering are presented. The hysteresis phenomenon of the sputtering voltage and deposition rate with the change of oxygen flow during sputtering process are discussed.

  4. Classical dynamics simulations of directional effects in sputtering from a bimetallic surface: c(2x2)-Pb/Cu(1 0 0)

    Energy Technology Data Exchange (ETDEWEB)

    Karolewski, M.A. E-mail: mkarol@ualberta.ca

    2002-07-01

    Classical dynamics sputtering simulations have been performed for a c(2x2)-Pb/Cu(1 0 0) target. The primary projectile was 3 keV Ar. The simulation model employs classical many-body tight-binding potentials to describe the bonding interactions between Pb and Cu atoms. Simulations were carried out for projectiles incident in the <0 1 1> and <0 1 0> azimuthal directions, with altitudinal angles (phi (cursive,open) Greek{sub i}) in the range 10-90 deg. The simulation results have been discussed with a view to understanding the sputtering characteristics of heavy metal overlayer systems and the information content of their surface mass spectra. Attention has been given to the following issues: (a) the enhancement of surface layer sputtering at grazing projectile incidence, (b) the angular distributions of sputtered atoms and (c) the prospects for surface structure determination by shadow cone enhanced sputtering. The yields of dimer and trimer cluster species sputtered from Pb/Cu(1 0 0) are also reported. For phi (cursive,open) Greek{sub i}=90 deg., the sputter yields (Y) of Pb and Cu are estimated to be 3.60{+-}0.1 and 2.56{+-}0.1, respectively. The sputter yields of Pb and Cu are predicted to display a strong dependence on the projectile altitudinal angle of incidence, phi (cursive,open) Greek, due to projectile channelling effects. However, variations in the projectile direction of incidence are found to modify the total sputter yields of Pb and Cu atoms in constant proportion, except near grazing incidence (phi (cursive,open) Greek{sub i}<25 deg. ), when an increase in the ratio of sputter yields Y(Pb)/Y(Cu) is predicted. The angular distributions of sputtered atoms are found to have similar characteristics to those reported for other metallic surfaces with (1 0 0) face-centred cubic (fcc) surface structures. The peak positions in these distributions are determined by the placement of the atoms which coordinate the lattice sites of origin of the sputtered atoms. It

  5. Sputtering of sodium on the planet Mercury

    Science.gov (United States)

    Mcgrath, M. A.; Johnson, R. E.; Lanzerotti, L. J.

    1986-01-01

    It is shown here that ion sputtering cannot account for the observed neutral sodium vapor column density on Mercury, but that it is an important loss mechanism for Na. Photons are likely to be the dominant stimulus, both directly through photodesorption and indirectly through thermal desorption of absorbed Na. It is concluded that the atmosphere produced is characterized by the planet's surface temperature, with the ion-sputtered Na contributing to a lesser, but more extended, component of the atmosphere.

  6. Sputtering of sodium on the planet Mercury

    Science.gov (United States)

    Mcgrath, M. A.; Johnson, R. E.; Lanzerotti, L. J.

    1986-01-01

    It is shown here that ion sputtering cannot account for the observed neutral sodium vapor column density on Mercury, but that it is an important loss mechanism for Na. Photons are likely to be the dominant stimulus, both directly through photodesorption and indirectly through thermal desorption of absorbed Na. It is concluded that the atmosphere produced is characterized by the planet's surface temperature, with the ion-sputtered Na contributing to a lesser, but more extended, component of the atmosphere.

  7. The lunar exosphere: The sputtering contribution

    Science.gov (United States)

    Wurz, P.; Rohner, U.; Whitby, J. A.; Kolb, C.; Lammer, H.; Dobnikar, P.; Martín-Fernández, J. A.

    2007-11-01

    We have extended our Monte Carlo model of exospheres [Wurz, P., Lammer, H., 2003. Icarus 164 (1), 1-13] by treating the ion-induced sputtering process from a known surface in a self-consistent way. The comparison of the calculated exospheric densities with experimental data, which are mostly upper limits, shows that all of our calculated densities are within the measurement limits. The total calculated exospheric density at the lunar surface of about 1×10 m as result of solar wind sputtering we find is much less than the experimental total exospheric density of about 10 m. We conclude that sputtering contributes only a small fraction of the total exosphere, at least close to the surface. Because of the considerably larger scale height of atoms released via sputtering into the exosphere, sputtered atoms start to dominate the exosphere at altitudes exceeding a few 1000 km, with the exception of some light and abundant species released thermally, e.g. H 2, He, CH 4, and OH. Furthermore, for more refractory species such as calcium, our model indicates that sputtering may well be the dominant mechanism responsible for the lunar atmospheric inventory, but observational data does not yet allow firm conclusions to be drawn.

  8. Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition

    Directory of Open Access Journals (Sweden)

    Chodun Rafal

    2015-12-01

    Full Text Available Encouraged by recent studies and considering the well-documented problems occurring during AlN synthesis, we have chosen two diagnostic methods which would enable us to fully control the process of synthesis and characterize the synthesized aluminum nitride films. In our experiment we have compared the results coming from OES measurements of plasma and circulating power characteristics of the power supply with basic features of the deposited layers. The dual magnetron system operating in AC mode was used in our studies. Processes of aluminum target sputtering were carried out in an atmosphere of a mixture of argon and nitrogen. The plasma emission spectra were measured with the use of a monochromator device. Analyses were made by comparing the positions and intensities of spectral lines of the plasma components. The results obtained allowed us to characterize the sputtering process under various conditions of gas mixture compositions as well as power distribution more precisely, which is reported in this work. The measured spectra were related to the deposition rate, the structure morphology of the films and chemical composition. Our work proved that the use of plasma OES and circulating power measurements make possible to control the process of sputtering and synthesis of deposited films in situ.

  9. Laser sputtering of highly oriented pyrolytic graphite at 248 nm

    Science.gov (United States)

    Krajnovich, Douglas J.

    1995-01-01

    The interaction of excimer laser pulses with a highly oriented pyrolytic graphite (HOPG) target has been studied. HOPG, a close approximation to single crystal graphite, was irradiated along a freshly cleaved basal plane in vacuum by pulses from a KrF excimer laser. The energy fluence was varied between 300-700 mJ/cm2, resulting in material removal rates of plasma effects are minimized. Time-of-flight distributions of the neutral carbon atoms and small carbon clusters were measured and inverted to obtain translational energy flux distributions and relative sputtering yields as a function of fluence. The translational energy distributions are remarkably close to Maxwell-Boltzmann distributions over most of the fluence range studied. However, the mean translational energies are far too high to reconcile with a simple thermal vaporization model. For example, the mean translational energy of C3, the most abundant species, increases from 1.1 eV at 305 mJ/cm2 to 31.7 eV at 715 mJ/cm2. Explanations are considered for this curious mix of thermal and non-thermal behavior. At the high end of our fluence range, the mean translational energies of C1, C2, C3 converge to a 1:2:3 ratio, indicating that the velocity distributions are almost identical. This particular result can be interpreted as a gas dynamic effect. Prolonged sputtering of the same target spot results in a falloff in the sputtering yield and the mean translational energies, but little change in the cluster size distribution. These effects are related to impurity induced topography formation on the target surface.

  10. DEPOSITION OF NIOBIUM AND OTHER SUPERCONDUCTING MATERIALS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING: CONCEPT AND FIRST RESULTS

    Energy Technology Data Exchange (ETDEWEB)

    High Current Electronics Institute, Tomsk, Russia; Anders, Andre; Mendelsberg, Rueben J.; Lim, Sunnie; Mentink, Matthijs; Slack, Jonathan L.; Wallig, Joseph G.; Nollau, Alexander V.; Yushkov, Georgy Yu.

    2011-07-24

    Niobium coatings on copper cavities have been considered as a cost-efficient replacement of bulk niobium RF cavities, however, coatings made by magnetron sputtering have not quite lived up to high expectations due to Q-slope and other issues. High power impulse magnetron sputtering (HIPIMS) is a promising emerging coatings technology which combines magnetron sputtering with a pulsed power approach. The magnetron is turned into a metal plasma source by using very high peak power density of ~ 1 kW/cm{sup 2}. In this contribution, the cavity coatings concept with HIPIMS is explained. A system with two cylindrical, movable magnetrons was set up with custom magnetrons small enough to be inserted into 1.3 GHz cavities. Preliminary data on niobium HIPIMS plasma and the resulting coatings are presented. The HIPIMS approach has the potential to be extended to film systems beyond niobium, including other superconducting materials and/or multilayer systems.

  11. Deposition of thin films by magnetron sputtering molybdenum in samples of pure copper; Deposicao de filmes finos de molibdenio por magnetron sputtering em amostra de cobre puro

    Energy Technology Data Exchange (ETDEWEB)

    Ferreira, N.M.; Almeida, E.O. de; Alves Junior, C. [Universidade Federal do Rio Grande do Norte, Campus Universitario Lagoa Nova, PPGCEM - Natal, RN (Brazil); Lourenco, J.M. [Instituto Federal de Educacao, Ciencias e Tecnologia do Rio Grande do Norte (IFRN), Natal, RN (Brazil)

    2010-07-01

    The deposition surface is a process of thermochemical treatment, which involves the deposition of a thin film usually about one to two microns on a metallic substrate, which constitutes one of the most important surface engineering techniques. The plasma deposition process with the configuration of magnetron sputtering it is removing material from a solid surface (target) through the impact of energetic particles from plasma. The aim of this study is to characterize the microstructure of the material under study using the techniques of optical microscopy and scanning electron microscopy. (author)

  12. Sputtered film thermistor IR detectors

    Science.gov (United States)

    Baliga, Shankar B.; Rost, Martin R.; Doctor, Alan P.

    1994-07-01

    The thermistor infrared detector or bolometer is the detector of choice in many classical remote sensing applications such as horizon sensing, noncontact thermometry, and industrial applications. In recent years, the authors have developed a thin film process where the thermistor material is deposited from a target directly onto the substrate. This is an advance over the labor intensive ceramic technology, where sintered flakes of the thermistor are bonded to the substrate. The thin film technique permits a variety of device constructions and configurations. Detectors fabricated on heat-sunk ceramic substrates can withstand high operating temperatures and large incident optical power, in both pulsed and CW laser measurements. For dc or low frequency measurements, the films can be deposited onto a thermally isolated membrane with applications in motion sensing, gas detection, and temperature measurement. Utilizing advances in micromachining a 2D array of thermally isolated microbolometer sensors, integrated onto a silicon wafer containing readout circuitry may be achieved. This paper describes the construction of the sputtered film thermistor detectors, their operation, and applications.

  13. Computer simulation of sputtering of graphite target in magnetron sputtering device with two zones of erosion

    Directory of Open Access Journals (Sweden)

    Bogdanov R.V.

    2015-03-01

    Full Text Available A computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.

  14. Relativistic heavy ion reactions

    Energy Technology Data Exchange (ETDEWEB)

    Brink, D.M.

    1989-08-01

    The theory of quantum chromodynamics predicts that if nuclear matter is heated to a sufficiently high temperature then quarks might become deconfined and a quark-gluon plasma could be produced. One of the aims of relativistic heavy ion experiments is to search for this new state of matter. These lectures survey some of the new experimental results and give an introduction to the theories used to interpret them. 48 refs., 4 tabs., 11 figs.

  15. Absorption Measurement of Zn Atom Density during ICP-assisted Magnetron Sputter-deposition of Al-doped ZnO Thin Films

    OpenAIRE

    2009-01-01

    This paper reports the outlines of hollow cathode (HCD) lamp absorption system for the density measurement of sputtered metal atoms in the inductively coupled plasma (ICP) assisted sputter-deposition process of Al doped ZnO thin films. As a result, absorbance of about 6.5% was obtained, which corresponds to the Zn atom density of 1.5×1012 cm-3.

  16. Protective infrared antireflection coating based on sputtered germanium carbide

    Science.gov (United States)

    Gibson, Des; Waddell, Ewan; Placido, Frank

    2011-09-01

    This paper describes optical, durablility and environmental performance of a germanium carbide based durable antireflection coating. The coating has been demonstrated on germanium and zinc selenide infra-red material however is applicable to other materials such as zinc sulphide. The material is deposited using a novel reactive closed field magnetron sputtering technique, offering significant advantages over conventional evaporation processes for germanium carbide such as plasma enhanced chemical vapour deposition. The sputtering process is "cold", making it suitable for use on a wide range of substrates. Moreover, the drum format provide more efficient loading for high throughput production. The use of the closed field and unbalanced magnetrons creates a magnetic confinement that extends the electron mean free path leading to high ion current densities. The combination of high current densities with ion energies in the range ~30eV creates optimum thin film growth conditions. As a result the films are dense, spectrally stable, supersmooth and low stress. Films incorporate low hydrogen content resulting in minimal C-H absorption bands within critical infra-red passbands such as 3 to 5um and 8 to 12um. Tuning of germanium carbide (Ge(1-x)Cx) film refractive index from pure germanium (refractive index 4) to pure germanium carbide (refractive index 1.8) will be demonstrated. Use of film grading to achieve single and dual band anti-reflection performance will be shown. Environmental and durability levels are shown to be suitable for use in harsh external environments.

  17. Ion beam sputtering of Ag – Angular and energetic distributions of sputtered and scattered particles

    Energy Technology Data Exchange (ETDEWEB)

    Feder, René, E-mail: rene.feder@iom-leipzig.de; Bundesmann, Carsten; Neumann, Horst; Rauschenbach, Bernd

    2013-12-01

    Ion beam sputter deposition (IBD) provides intrinsic features which influence the properties of the growing film, because ion properties and geometrical process conditions generate different energy and spatial distribution of the sputtered and scattered particles. A vacuum deposition chamber is set up to measure the energy and spatial distribution of secondary particles produced by ion beam sputtering of different target materials under variation of geometrical parameters (incidence angle of primary ions and emission angle of secondary particles) and of primary ion beam parameters (ion species and energies). A representative set of Ag thin films is deposited arranged on a substrate holder equatorial to the Ag target in steps of 10° and characterized concerning their film thickness by profilometry to determine the angular distribution of the sputtered particles. The film thickness distributions show a tilted, cosine-like shape and a shifting of the maximum position depending on the primary particle energy and incidence angle of the primary ions. The energy distributions of sputtered and scattered ions and of sputtered neutrals are measured with an energy-selective mass spectrometer. The average energy of the sputtered ions increases with increasing emission angle and also increases with increasing incidence angle of the primary ions. In contrast, the average energy of the sputtered ions is nearly unaffected by the primary particle energy and particle species. The energy distribution of the scattered Ar ions reveals high energetic maxima which shift with increasing emission angle to higher energies. These maxima are not observed for Xe bombardment. The total energies of sputtered and scattered ions show significant differences between the two bombarding species. The maximum of the energy distribution of sputtered Ag neutrals is used to conclude on the surface binding energy of Ag (2.72 eV). All experimental data are compared with Monte Carlo simulations done with

  18. Sequential determination of heavy metals in environmental water samples by flow injection-chemical vapour generation-inductively coupled plasma mass spectrometry

    OpenAIRE

    Sanchez,Irene; García, Amparo; Vereda, Elisa I.; Cano, José Manuel

    2013-01-01

    The toxicity of “heavy metals” has been well recognized for a long time. Often the non-specific term “heavy metals” is used for three of the metals, cadmium, mercury and lead. These have large bioconcentration factors in marine organism, are highly toxic and, unlike many of the transition elements have no known natural biological functions. For these reasons these metals generate the greatest concern for the general public and therefore also for environmental agencies in the majority of state...

  19. Deuterium Retention and Physical Sputtering of Low Activation Ferritic Steel

    Institute of Scientific and Technical Information of China (English)

    T. Hino; K. Yamaguchi; Y. Yamauchi; Y. Hirohata; K. Tsuzuki; Y.Kusama

    2005-01-01

    Low activation materials have to be developed toward fusion demonstration reactors. Ferritic steel, vanadium alloy and SiC/SiC composite are candidate materials of the first wall,vacuum vessel and blanket components, respectively. Although changes of mechanical-thermal properties owing to neutron irradiation have been investigated so far, there is little data for the plasma material interactions, such as fuel hydrogen retention and erosion. In the present study,deuterium retention and physical sputtering of low activation ferritic steel, F82H, were investigated by using deuterium ion irradiation apparatus.After a ferritic steel sample was irradiated by 1.7 kev D+ ions, the weight loss was measured to obtain the physical sputtering yield. The sputtering yield was 0.04, comparable to that of stainless steel. In order to obtain the retained amount of deuterium, technique of thermal desorption spectroscopy (TDS) was employed to the irradiated sample. The retained deuterium desorbed at temperature ranging from 450 K to 700 K, in the forms of DHO, D2, D2O and hydrocarbons. Hence, the deuterium retained can be reduced by baking with a relatively low temperature. The fluence dependence of retained amount of deuterium was measured by changing the ion fluence. In the ferritic steel without mechanical polish, the retained amount was large even when the fluence was low. In such a case, a large amount of deuterium was trapped in the surface oxide layer containing O and C. When the fluence was large, the thickness of surface oxide layer was reduced by the ion sputtering, and then the retained amount in the oxide layer decreased. In the case of a high fluence, the retained amount of deuterium became comparable to that of ferritic steel with mechanical polish or SS 316 L, and one order of magnitude smaller than that of graphite. When the ferritic steel is used, it is required to remove the surface oxide layer for reduction of fuel hydrogen retention.Ferritic steel sample was

  20. Heavy-flavour and quarkonia in heavy-ion collisions

    Directory of Open Access Journals (Sweden)

    Rossi A.

    2013-11-01

    Full Text Available The comparison of heavy-flavour hadron production in proton-proton, proton-Pb and Pb–Pb collisions at the LHC offers the opportunity to investigate the properties of the high-density colour-deconfined state of strongly-interacting matter (Quark Gluon Plasma, QGP that is expected to be formed in high-energy collisions of heavy nuclei. A review of the main quarkonium and open heavy-flavour results obtained by the ALICE, ATLAS and CMS experiments is presented.

  1. Dynamical collisional energy loss and transport properties of on- and off-shell heavy quarks in vacuum and in the Quark Gluon Plasma

    CERN Document Server

    Berrehrah, Hamza; Aichelin, Jörg; Cassing, Wolfgang; Bratkovskaya, Elena

    2014-01-01

    In this study we evaluate the dynamical collisional energy loss of heavy quarks, their interaction rate as well as the different transport coefficients (drag and diffusion coefficients, $\\hat{q}$, etc). We calculate these different quantities for i) perturbative partons (on-shell particles in the vacuum with fixed and running coupling) and ii) for dynamical quasi-particles (off-shell particles in the QGP medium at finite temperature $T$ with a running coupling in temperature as described by the dynamical quasi-particles model). We use the perturbative elastic $(q(g) Q \\rightarrow q (g) Q)$ cross section for the first case, and the Infrared Enhanced Hard Thermal Loop cross sections for the second. The results obtained in this work demonstrate the effects of a finite parton mass and width on the heavy quark transport properties and provide the basic ingredients for an explicit study of the microscopic dynamics of heavy flavors in the QGP - as formed in relativistic heavy-ion collisions - within transport approa...

  2. Tailoring of antibacterial Ag nanostructures on TiO2 nanotube layers by magnetron sputtering.

    Science.gov (United States)

    Uhm, Soo-Hyuk; Song, Doo-Hoon; Kwon, Jae-Sung; Lee, Sang-Bae; Han, Jeon-Geon; Kim, Kyoung-Nam

    2014-04-01

    To reduce the incidence of postsurgical bacterial infection that may cause implantation failure at the implant-bone interface, surface treatment of titanium implants with antibiotic materials such as silver (Ag) has been proposed. The purpose of this work was to create TiO2 nanotubes using plasma electrolytic oxidation (PEO), followed by formation of an antibacterial Ag nanostructure coating on the TiO2 nanotube layer using a magnetron sputtering system. PEO was performed on commercially pure Ti sheets. The Ag nanostructure was added onto the resulting TiO2 nanotube using magnetron sputtering at varying deposition rates. Field emission scanning electron microscopy and transmission electron microscopy were used to characterize the surface, and Ag content on the TiO2 nanotube layer was analyzed by X-ray diffraction and X-ray photoelectron spectroscopy. Scanning probe microscopy for surface roughness and contact angle measurement were used to indirectly confirm enhanced TiO2 nanotube hydrophilicity. Antibacterial activity of Ag ions in solution was determined by inductively coupled plasma mass spectrometry and antibacterial testing against Staphylococcus aureus (S. aureus). In vitro, TiO2 nanotubes coated with sputtered Ag resulted in significantly reduced S. aureus. Cell viability assays showed no toxicity for the lowest sputtering time group in the osteoblastic cell line MC3T3-E1. These results suggest that a multinanostructured layer with a biocompatible TiO2 nanotube and antimicrobial Ag coating is a promising biomaterial that can be tailored with magnetron sputtering for optimal performance.

  3. Open heavy-flavor production and suppression in heavy-ion collisions

    CERN Document Server

    Nahrgang, Marlene

    2015-01-01

    Heavy-flavor observables are valuable probes of the quark-gluon plasma, which is expected to be produced in ultrarelativistic heavy-ion collisions. These experiments offer the unique opportunity to study strongly interacting matter at high temperatures and densities in the laboratory. In this overview talk I will summarize the current theoretical status of heavy-flavor production and suppression in heavy-ion collisions and discuss open challenges.

  4. Surface sticking probabilities for sputtered atoms of Nb-93 and Rh-103

    Science.gov (United States)

    Weller, M. R.; Tombrello, T. A.

    1979-01-01

    The capture coefficient probabilities for sputtered atoms of Nb-93 and Rh-103 incident on Al2O3 surfaces were measured using the backscattering of MeV heavy ions. In the circumstance where the collecting surface is thickly covered, the sticking probabilities integrated over the energy distribution of sputtered atoms are 0.97 plus or minus 0.01 for Nb-93 and 0.95 plus or minus 0.01 for Rh-103 respectively. In the limit of negligible areal coverage of the collector, the accuracy is less; in this case the sticking probabilities are 0.97 + 0.03 or -0.08 and 0.95 + 0.05 or -0.08.

  5. Thin films preparation of the Ti-Al-O system by rf-sputtering;Preparacion de peliculas delgadas del sistema Ti-Al-O mediante rf-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Montes de Oca, J. A.; Ceballos A, J.; Galaviz P, J. [IPN, Centro de Investigacion en Ciencia Aplicada y Tecnologia Avanzada, Unidad Altamira, Km 14.5 Carretera Tampico-Puerto Industrial Altamira, 89600 Altamira, Tamaulipas (Mexico); Manaud, J. P.; Lahaye, M. [Centre National de la Recherche Scientifique, Institut de Chimie de la Matiere Condensee, Universite Bordeaux I, 87, Av. du Dr. Schweitzer, F-33608 Pessac-Cedex (France); Munoz S, J., E-mail: jmontedeocacv@ipn.m [IPN, Centro de Investigacion y de Estudios Avanzados, Unidad Queretaro, Libramiento Norponiente No. 2000, Fracc. Real de Juriquilla, 76230 Santiago de Queretaro, Qro. (Mexico)

    2010-07-01

    In the present work Ti-Al-O thin films were synthesized by rf-sputtering technique on glass and silicon (Si) substrates using Ti Al and Ti{sub 3}Al targets in a sputtering chamber with an Ar-O{sub 2} atmosphere. Ti-Al-O thin films were obtained varying experimental parameters such as oxygen percent fed to the reaction chamber, plasma power density and substrate temperature. The films deposited on glass substrates were used to evaluate their optical properties, while those deposited on Si substrates were used to evaluate mechanical and morphological properties. The crystalline structure, morphology, chemical composition and optical properties of the films were evaluated by X-ray diffraction, high-resolution scanning electron microscopy, Auger electron microscopy and visible UV spectroscopy. Films thicknesses were measured using a profiler. The roughness and mechanical properties such as hardness and Young modulus were analyzed by atomic force microscopy and nano indentation technique, respectively. (Author)

  6. Molecular dynamics simulation of gold cluster growth during sputter deposition

    Science.gov (United States)

    Abraham, J. W.; Strunskus, T.; Faupel, F.; Bonitz, M.

    2016-05-01

    We present a molecular dynamics simulation scheme that we apply to study the time evolution of the self-organized growth process of metal cluster assemblies formed by sputter-deposited gold atoms on a planar surface. The simulation model incorporates the characteristics of the plasma-assisted deposition process and allows for an investigation over a wide range of deposition parameters. It is used to obtain data for the cluster properties which can directly be compared with recently published experimental data for gold on polystyrene [M. Schwartzkopf et al., ACS Appl. Mater. Interfaces 7, 13547 (2015)]. While good agreement is found between the two, the simulations additionally provide valuable time-dependent real-space data of the surface morphology, some of whose details are hidden in the reciprocal-space scattering images that were used for the experimental analysis.

  7. Collimated Magnetron Sputter Deposition for Mirror Coatings

    DEFF Research Database (Denmark)

    Vickery, A.; Cooper-Jensen, Carsten P.; Christensen, Finn Erland

    2008-01-01

    At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence that a collimat......At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence...... that a collimation of the sputtered particles is an efficient way to suppress the interfacial roughness of the produced multilayer. We present two different types of collimation optimized for the production of low roughness curved mirrors and flat mirrors, respectively....

  8. Electrochemical Behaviour of Sputtering Deposited DLC Films

    Institute of Scientific and Technical Information of China (English)

    LIU Erjia; ZENG A,LIU L X

    2003-01-01

    Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion bombardment on the surface of growing film is one of the major parameters that control the atom mobility on the film surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering power density, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfuric acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp3 content of the DLC films.

  9. Electrochemical Behaviour of Sputtering Deposited DLC Films

    Institute of Scientific and Technical Information of China (English)

    LIUErjia; ZENGA; LIULX

    2003-01-01

    Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion hombardment on the surface of growing film is one of the major parameters that control the atom mobility on the flirt1 surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering powerdensity, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfufic acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp3 content of the DLC films.

  10. Sputtering and mixing of supported nanoparticles

    Energy Technology Data Exchange (ETDEWEB)

    Jiménez-Sáez, J.C., E-mail: jc.jimenez@upm.es [Dept. Física y Química Aplicadas a la Técnica Aeronaútica, ETSIAE, Universidad Politécnica de Madrid (UPM), 28040 Madrid (Spain); Pérez-Martín, A.M.C.; Jiménez-Rodríguez, J.J. [Dept. Física Aplicada III (Electricidad y Electrónica), Facultad de Ciencias Físicas, Universidad Complutense de Madrid (UCM), 28040 Madrid (Spain)

    2013-12-01

    Sputtering and mixing of Co nanoparticles supported in Cu(0 0 1) under 1-keV argon bombardment are studied using molecular-dynamics simulations. Particles of different initial size have been considered. The cluster height decreases exponentially with increasing fluence. In nanoparticles, sputtering yield is significantly enhanced compared to bulk. In fact, the value of this magnitude depends on the cluster height. A theoretical model for sputtering is introduced with acceptable results compared to those obtained by simulation. Discrepancies happen mainly for very small particles. Mixing rate at the interface is quantified; and besides, the influence of border effects for clusters of different initial size is assessed. Mixing rate and border length–surface area ratio for the initial interface show a proportionality relation. The phenomenon of ion-induced burrowing of metallic nanoparticles is analysed.

  11. Emission characteristics and electron kinetic coefficients of the plasma of a transverse volume discharge initiated in a mixture of heavy inert gases with chlorine molecules

    Science.gov (United States)

    Shuaibov, A. K.; Chygin, V. I.; Shimon, L. L.; Shevera, I. V.; Gorun, P. P.; Obukhovskii, R. O.

    2010-05-01

    The results of studying the radiation due to argon, krypton, and xenon monochloride bands, as well as to the bands of chlorine molecules, from the plasma of a transverse Ar-Kr-Xe-Cl2 volume discharge are reported. The working mixture of a pulse radiation source is optimized with regard to its pressure and elemental composition and parameters of an excitation system. By numerically solving the Boltzmann kinetic equation for the electron energy distribution function, the transport characteristics of plasma electrons and discharge power specific losses are found for different values of the reduced electric field strength. The plasma parameters are simulated for the quaternary mixture, which is most appropriate for a multiwave UV-VUV source. Qualitative analysis is conducted for the most important electron processes in the multicomponent plasma that govern the joint formation of argon, krypton, and xenon monochlorides in the transverse discharge.

  12. Characterization of Hydroxyapatite Film on Titanium Substrate by Sputtering Technique

    Institute of Scientific and Technical Information of China (English)

    2005-01-01

    Radiofrequent magnetron sputtering technique was used to produce calcium phosphate coated on the titanium substrates, and the sputtered coating films were crystallized in an autoclave at 110 ℃ using a low temperature hydrothermal technique. The crystallization of as- sputtered coating film on the titanium substrates were amorphous calcium phosphate film. However, after the hydrothermal technique, calcium phosphate crystals grew and these were columnar crystal. The Ca/ P ratio of sputtered coating films in 1.6 to 2.0.

  13. Titanium aluminum nitride sputtered by HIPIMS

    Science.gov (United States)

    Weichart, Juergen; Lechthaler, Markus

    2012-09-01

    TiAlN was sputtered reactively by HIPIMS in the target compositions Ti/Al 33/67 and 50/50 using a modified OC Oerlikon Balzers INNOVA coating equipment. The resulting film properties like deposition rate, surface roughness, hardness, Young's modulus, wear, and film stress were analyzed as function of the nitrogen gas flow, pressure, target-substrate distance, and substrate bias. Furthermore, the films were characterized by X-ray diffraction and secondary electron microscopy of the cross section and the surface appearance. The process characteristics and film properties were compared with pulsed DC sputtering under the same conditions.

  14. Lithium insertion in sputtered vanadium oxide film

    DEFF Research Database (Denmark)

    West, K.; Zachau-Christiansen, B.; Skaarup, S.V.

    1992-01-01

    were oxygen deficient compared to V2O5. Films prepared in pure argon were reduced to V(4) or lower. The vanadium oxide films were tested in solid-state lithium cells. Films sputtered in oxygen showed electrochemical properties similar to crystalline V2O5. The main differences are a decreased capacity...... above 3.0 V, showing that V is partially reduced, and a broadening of the capacity peaks, showing that the crystallinity of these films is rather low. The film sputtered in argon behaved differently, discharging at a very low potential, 1.9 V versus Li, in the first cycle. In subsequent cycles...

  15. A high power impulse magnetron sputtering model to explain high deposition rate magnetic field configurations

    Science.gov (United States)

    Raman, Priya; Weberski, Justin; Cheng, Matthew; Shchelkanov, Ivan; Ruzic, David N.

    2016-10-01

    High Power Impulse Magnetron Sputtering (HiPIMS) is one of the recent developments in the field of magnetron sputtering technology that is capable of producing high performance, high quality thin films. Commercial implementation of HiPIMS technology has been a huge challenge due to its lower deposition rates compared to direct current Magnetron Sputtering. The cylindrically symmetric "TriPack" magnet pack for a 10 cm sputter magnetron that was developed at the Center for Plasma Material Interactions was able to produce higher deposition rates in HiPIMS compared to conventional pack HiPIMS for the same average power. The "TriPack" magnet pack in HiPIMS produces superior substrate uniformity without the need of substrate rotation in addition to producing higher metal ion fraction to the substrate when compared to the conventional pack HiPIMS [Raman et al., Surf. Coat. Technol. 293, 10 (2016)]. The films that are deposited using the "TriPack" magnet pack have much smaller grains compared to conventional pack DC and HiPIMS films. In this paper, the reasons behind the observed increase in HiPIMS deposition rates from the TriPack magnet pack along with a modified particle flux model is discussed.

  16. Experimental investigation of the energy and temperature dependence of beryllium self sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Korshunov, S.N.; Guseva, M.I.; Stolijarova, V.G. [RRC Kurchatov Institute, Moscow (Russian Federation)

    1995-09-01

    The low-Z metal beryllium is considered as plasma facing material (PFM) for the ITER. It is expected that operation temperature range of beryllium PFM will be (670 - 1070) K. While experimental Be-sputtering data bases exist for H{sup +}, D{sup +} and He{sup +}-ions, the self-sputtering yields of Be have only been estimated by computer simulation. In this paper we report the experimental results on the energy and temperature dependence of the beryllium self-sputtering yield (S). The energy dependence of S{sup s} in the energy range (0.5 - 10.0) keV was measured at 670 K. The self-sputtering yield of Be attains its maximal value at the ion energy of 1.5 keV, being equal to 0.32 {+-} at./ion. Comparison of the experimental results and theoretical prediction shows a good agreement for energy dependence of S{sup s}. The temperature dependence of S{sup s} in the temperature range (370-1070)K was obtained for 0.9keV Be{sup +}-ions. The value of S{sup s} is not changed up to 870 K. It sharply increases at the temperatures above 870 attaining the value of 0.75 at./ion at 1070 K.

  17. A review of basic phenomena and techniques for sputter-deposition of high temperature superconducting films

    Energy Technology Data Exchange (ETDEWEB)

    Auciello, O. (Microelectronics Center of North Carolina, Research Triangle Park, NC (USA) North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering); Ameen, M.S.; Kingon, A.I.; Lichtenwalner, D.J. (North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering); Krauss, A.R. (Argonne National Lab., IL (USA))

    1990-01-01

    The processes involved in plasma and ion beam sputter-deposition of high temperature superconducting thin films are critically reviewed. Recent advances in the development of these techniques are discussed in relation to basic physical phenomena, specific to each technique, which must be understood before high quality films can be produced. Control of film composition is a major issue in sputter-deposition of multicomponent materials. Low temperature processing of films is a common goal for each technique, particularly in relation to integrating high temperature superconducting films with the current microelectronics technology. It has been understood for some time that for Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} deposition, the most intensely studied high-{Tc} compound, incorporation of sufficient oxygen into the film during deposition is necessary to produce as-deposited superconducting films at relatively substrate temperatures. Recent results have shown that with the use of suitable buffer layers, high quality Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} sputtered films can be obtained on Si substrates without the need for post-deposition anneal processing. This review is mainly focussed on issues related to sputter-deposition of Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} thin films, although representative results concerning the bismuth and thallium based compounds are included. 143 refs., 11 figs.

  18. Reactive sputtering of TiN films at large substrate to target distances

    Energy Technology Data Exchange (ETDEWEB)

    Musil, J.; Kadlec, S. (Czechosovak Academy of Sciences, Prague (Czechoslovakia). Inst. of Physics)

    1990-01-01

    This paper is a critical review of the present status of the magnetron ion sputter plating of thin CiN films. Thus different possibilities of extracting high ion currents 1{sub s} from the magnetron discharge to substrates located not only at standard target to substrate distances d{sub S-T} of about 50 mm but also at larger distances d{sub S-T} are discussed in detail. Special attention is devoted to magnetron sputtering systems with enhanced ionization, to plasma confinement in the magnetron sputtering systems and to the discharge characteristics of an unbalanced magnetron (UM). It is shown that a UM can be operated in the regime of a double-site-sustained discharge (DSSD) and in this case large 1{sub s} can be extracted to substrates located in large D{sub S-T} of about 200 mm and even at high pressures p = 5 Pa. A physical comparison of the conventional magnetron (CM), UM and DSSD is also given. Considerable attention is also devoted to the effect of ion bombardment on properties of TiN films created in the sputtering system using DSSD. (author).

  19. Influence and determinative factors of ion-to-atom arrival ratio in unbalanced magnetron sputtering systems

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods.Unbalanced magnetron sputtering,by producing dense secondary plasma around the substrate,provides a high ion current density.The closed-field unbalanced magnetron sputtering system (CFUBMS) has been established as a versatile technique for high-rate deposition high-quality metal,alloy,and ceramic thin films.The key factor in the CFUBMS system is the ability to transport high ion currents to the substrate,which can enhance the formation of full dense coatings at relatively low value homologous temperature.The investigation shows that the energy of ions incidenced at the substrate and the ratio of the flux of these ions to the flux of condensing atoms are the fundamental parameters in determining the structure and properties of films produced by ion-assisted deposition processes.Increasing ion bombardment during deposition combined with increasing mobility of the condensing atoms favors the formation of a dense microstructure and a smooth surface.

  20. Study of cobalt mononitride thin films prepared using DC and high power impulse magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Gupta, Rachana, E-mail: dr.rachana.gupta@gmail.com [Institute of Engineering & Technology, DAVV, Khandwa Road, Indore – 452 017 (India); Pandey, Nidhi; Behera, Layanta; Gupta, Mukul [UGC-DAE Consortium for Scientific Research, Khandwa Road, University Campus, Indore-452001 (India)

    2016-05-23

    In this work we studied cobalt mononitride (CoN) thin films deposited using dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS). A Co target was sputtered using pure N{sub 2} gas alone as the sputtering medium. Obtained long-range structural ordering was studies using x-ray diffraction (XRD), short-range structure using Co L{sub 2,3} and N K absorption edges using soft x-ray absorption spectroscopy (XAS) and the surface morphology using atomic force microscopy (AFM). It was found that HiPIMS deposited films have better long-range ordering, better stoichiometric ratio for mononitride composition and smoother texture as compared to dcMS deposited films. In addition, the thermal stability of HiPIMS deposited CoN film seems to be better. On the basis of different type of plasma conditions generated in HiPIMS and dcMS process, obtained results are presented and discussed.

  1. Propagation of heavy baryons in heavy-ion collisions

    Science.gov (United States)

    Das, Santosh K.; Torres-Rincon, Juan M.; Tolos, Laura; Minissale, Vincenzo; Scardina, Francesco; Greco, Vincenzo

    2016-12-01

    The drag and diffusion coefficients of heavy baryons (Λc and Λb ) in the hadronic phase created in the latter stage of the heavy-ion collisions at RHIC and LHC energies have been evaluated recently. In this work we compute some experimental observables, such as the nuclear suppression factor RA A and the elliptic flow v2 of heavy baryons at RHIC and LHC energies, highlighting the role of the hadronic phase contribution to these observables, which are going to be measured at Run 3 of LHC. For the time evolution of the heavy quarks in the quark and gluon plasma (QGP) and heavy baryons in the hadronic phase, we use the Langevin dynamics. For the hadronization of the heavy quarks to heavy baryons we employ Peterson fragmentation functions. We observe a strong suppression of both the Λc and Λb . We find that the hadronic medium has a sizable impact on the heavy-baryon elliptic flow whereas the impact of hadronic medium rescattering is almost unnoticeable on the nuclear suppression factor. We evaluate the Λc/D ratio at RHIC and LHC. We find that the Λc/D ratio remains unaffected due to the hadronic phase rescattering which enables it as a nobel probe of QGP phase dynamics along with its hadronization.

  2. ' HEAVY METALS

    African Journals Online (AJOL)

    exposed fish were about 3-5 times higher than the concentrations detected in control fish. ... The outcome effect 15 impairment of carbohydrate metabolism, which caused fish ..... of pesticides, heavy metal, detergent and petroleum.

  3. Simulation of tungsten sputtering with EDGE2D–EIRENE in low triangularity L-mode JET ITER like wall configuration

    Energy Technology Data Exchange (ETDEWEB)

    Harting, D., E-mail: d.harting@fz-juelich.de [Institut für Energie- und Klimaforschung – IEK-4, Plasmaphysik, Forschungszentrum Jülich, TEC, Association EURATOM-FZJ, D-52425 Jülich (Germany); Groth, M. [Aalto University, Association EURATOM-Tekes, Otakaari 4, 02015 Espoo (Finland); Beurskens, M. [Culham Science Centre, Association EURATOM-CCFE Fusion, Abingdon, Oxon OX14 3DB (United Kingdom); Boerner, P. [Institut für Energie- und Klimaforschung – IEK-4, Plasmaphysik, Forschungszentrum Jülich, TEC, Association EURATOM-FZJ, D-52425 Jülich (Germany); Brix, M. [Culham Science Centre, Association EURATOM-CCFE Fusion, Abingdon, Oxon OX14 3DB (United Kingdom); Coenen, J.W. [Institut für Energie- und Klimaforschung – IEK-4, Plasmaphysik, Forschungszentrum Jülich, TEC, Association EURATOM-FZJ, D-52425 Jülich (Germany); Corrigan, G. [Culham Science Centre, Association EURATOM-CCFE Fusion, Abingdon, Oxon OX14 3DB (United Kingdom); Lehnen, M. [Institut für Energie- und Klimaforschung – IEK-4, Plasmaphysik, Forschungszentrum Jülich, TEC, Association EURATOM-FZJ, D-52425 Jülich (Germany); Marsen, S. [Max-Planck Institut für Plasmaphysik, Association EURATOM, D-17491 Greifswald (Germany); Rooij, G. van [FOM Institute for Plasma Physics, Rijnhuizen PO Box 1207, 3420BE Nieuwegein (Netherlands); and others

    2013-07-15

    The 2D edge plasma transport code EDGE2D-EIRENE has been upgraded to account for the actual material and geometric properties of the newly installed ITER like wall (ILW) at JET. This includes the simulation of beryllium and tungsten impurities as well as a revised treatment of sputtering by main plasma and impurity atoms and ions (including self sputtering). In this work, two L-mode density regimes, a sheath limited and a high recycling regime, are presented with a power scan from 2 to 6 MW. Tungsten is self consistently simulated with the scrape of layer (SOL) plasma by the EDGE2D–EIRENE code. A detailed analysis of the tungsten sputtering is presented, resolving the individual contributions of the different atomic and ion species in the simulations.

  4. Modification of subsurface structure in TiC-(Ni-Cr) cermet composite under pulsed electron-beam irradiation of samples in plasmas of light and heavy inert gases

    Science.gov (United States)

    Ovcharenko, V. E.; Ivanov, K. V.; Baohai, Yu; Zhengkun, Li; Hua, Xu Yun; Lisheng, Zhong

    2016-11-01

    Experiments with metal ceramic alloys with various ceramic content proved that the performance degree of pulsed electron-ion-plasma irradiation as a technology of creating a surface layer multilevel structural phase condition, where particles are measured within a nano dimensional diapason, depends on ionization energy degree as well as on plasma-supporting gas atomic weight. When ionization energy falls parallel to plasma-supporting gas atomic weight growth, ceramic component particles dissolve in a metal binding melt more quickly, and an accelerated dispersion of ceramic particles to nano sized level can be observed. A multilevel structural phase condition causes friction ratio decrease, while a metal ceramic alloy surface layer wear ability increases many-folds.

  5. IGM metal enrichment through dust sputtering

    CERN Document Server

    Bianchi, S; Bianchi, Simone; Ferrara, Andrea

    2005-01-01

    We study the motion of dust grains into the Intergalactic Medium (IGM) around redshift z=3, to test the hypothesis that grains can efficiently pollute the gas with metals through sputtering. We use the results available in the literature for radiation-driven dust ejection from galaxies as initial conditions, and follow the motion onward. Via this mechanism, grains are ejected into the IGM with velocities >100 km/s; as they move supersonically, grains can be efficiently eroded by non-thermal sputtering. However, Coulomb and collisional drag forces effectively reduce the charged grain velocity. Up-to-date sputtering yields for graphite and silicate (olivine) grains have been derived using the code TRIM, for which we provide analytic fits. After training our method on a homogeneous density case, we analyze the grain motion and sputtering in the IGM density field as derived from a LambdaCDM cosmological simulation at z = 3.27. We found that only large (a >~ 0.1-um) grains can travel up to considerable distances (...

  6. Sputtering of Surfaces of the Solid Hydrogens

    DEFF Research Database (Denmark)

    Schou, Jørgen; Thestrup Nielsen, Birgitte; Svendsen, Winnie Edith

    1998-01-01

    Sputtering of the solid hydrogens by electrons and ions exhibits features that may be related to quantum properties of these solids, i.e. a drastic enhancement of the yield for electron–bombarded thick deuterium films and a thermal peak at low ejection energies in the energy distribution...

  7. Research on Sputtering of Ferroelectric Thin Films

    Science.gov (United States)

    1990-02-01

    and d1,5 coefficients as a function of composition in the PbNb 2 06-BaNb2O6 system. Fig. 4 Schematic representation of the sputter coating process. Fig...and photochromic 2 activities, and promises excellent optoelectronic properties. There have been numerous concepts for its application in elec- tronic

  8. RF Sputtering of Gold Contacts On Niobium

    Science.gov (United States)

    Barr, D. W.

    1983-01-01

    Reliable gold contacts are deposited on niobium by combination of RF sputtering and photolithography. Process results in structures having gold only where desired for electrical contact. Contacts are stable under repeated cycling from room temperature to 4.2 K and show room-temperature contact resistance as much as 40 percent below indium contacts made by thermalcompression bonding.

  9. 相对论重离子碰撞夸克胶子等离子体对磁场分布的影响%Effect of quark gluon plasma on the magnetic field distribution in relativistic heavy ion collisions

    Institute of Scientific and Technical Information of China (English)

    陈勋; 冯笙琴

    2016-01-01

    首先利用Woods‐Saxon分布,计算相对论重离子碰撞磁场空间分布;并在此基础上考虑夸克胶子等离子体(QGP)的响应,假定QGP为理想导体情况下,研究磁场在QGP环境下的分布特征。%Spatial distributions of magnetic field are calculated in relativistic heavy ion collision based on Woods‐Saxon dis‐tribution .We further study the characteristics of magnetic field distribution while considering Quark gluon plasma (QGP) as an ideal conductor response in a QGP environment .

  10. Electron Cyclotron Resonance-Sputtered Nanocarbon Film Electrode Compared with Diamond-Like Carbon and Glassy Carbon Electrodes as Regards Electrochemical Properties and Biomolecule Adsorption

    Science.gov (United States)

    Xue, Qiang; Kato, Dai; Kamata, Tomoyuki; Umemura, Shigeru; Hirono, Shigeru; Niwa, Osamu

    2012-09-01

    The electrochemical properties and biocompatible characteristics at an electron cyclotron resonance (ECR)-sputtered nanocarbon film electrode, a diamond-like carbon (DLC) electrode and a glassy carbon (GC) electrode have been studied. The three carbon electrodes show significant current reductions with increased peak separations as a result of protein fouling before oxygen plasma treatment, but the current reductions of the ECR-sputtered nanocarbon and DLC film electrodes are smaller than that of the GC electrode due to their superior surface flatness. The oxygen plasma pretreated ECR-sputtered nanocarbon film electrode exhibits a significant improvement in anti-fouling performance with an improved electron transfer. This is because the pretreated ECR-sputtered nanocarbon film enabled the surface to introduce surface oxygen functionalities that not only improve the interaction between the analytes and the electrode surface but also make the film surface more hydrophilic, which is important for the suppression of biomolecule adsorption. At the same time, the pretreated ECR-sputtered nanocarbon film also retained an ultraflat surface even after pretreatment as a result of the low background current. This excellent performance can only be achieved with our ECR-sputtered nanocarbon film, indicating that our film is promising for application to electrochemical detectors for various biomolecular analytes.

  11. Characterization of sputtered ZnO films under different sputter-etching time of substrate

    Institute of Scientific and Technical Information of China (English)

    LI Cui-ping; YANG Bao-he; QIAN Li-rong; XU Sheng; DAI Wei; LI Ming-ji; LI Xiao-wei; GAO Cheng-yao

    2011-01-01

    Polycrystalline ZnO films are prepared using radio frequency magnetron sputtering on glass substrates which are sputteretched for different time.Both the size of ZnO grains and the root-mean-square (RMS) roughness decrease,as the sputteretching time of the substrate increases.More Zn atoms are bound to O atoms in the films,and the defect concentration is decreased with increasing sputter-etching time of substrate.Meanwhile,the crystallinity and c-axis orientation are improved at longer sputter-etching time of the substrate.The Raman peaks at 99 cm-1,438 cm-1 and 589 cm-1 are identified as E2(low),E2(high) and E1(LO) modes,respectively,and the position of E1(LO) peak blue shifts at longer sputter-etching time.The transmittances of the films,which are deposited on the substrate and etched for 10 min and 20 min,are higher in the visible region than that of the films deposited under longer sputter-etching time of 30 min.The bandgap increases from 3.23 eV to 3.27 eV with the increase of the sputter-etching time of substrate.

  12. Imaging of uranium on rat brain sections using laser ablation inductively coupled plasma mass spectrometry: a new tool for the study of critical substructures affined to heavy metals in tissues.

    Science.gov (United States)

    Becker, J Sabine; Dobrowolska, Justina; Zoriy, Miroslav; Matusch, Andreas

    2008-09-01

    The specific toxicity of trace metals and compounds largely depends on their bioavailability in different organs or compartments of the organism considered. Imaging mass spectrometry (IMS) using laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) with a spatial resolution in the 100 microm range was developed and employed to study heavy metal distribution in brain tissues for toxicological screening. Rat brain post-mortem tissues were stained in an aqueous solution of either uranium or neodymium (metal concentration 100 microg g(-1)) for 3 h. The incubation of heavy metal in thin slices of brain tissue is followed by an imaging mass spectrometric LA-ICP-MS technique. Stained rat brain tissue (thickness 30 microm) were scanned with a focused laser beam (wavelength 266 nm, diameter of laser crater 100 microm and laser power density 3 x 10(9) W cm(-2)). The ion intensities of (235)U(+), (238)U(+), (145)Nd(+) and (146)Nd(+) were measured by LA-ICP-MS within the ablated area. For quantification purposes, matrix-matched laboratory standards were prepared by dosing each analyte to the pieces of homogenized brain tissue. Imaging LA-ICP-MS allows structures of interest to be identified and the relevant dose range to be estimated.

  13. News on sputter theory: Molecular targets, nanoparticle desorption, rough surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.d [Fachbereich Physik und Forschungszentrum OPTIMAS, Universitaet Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Anders, Christian [Fachbereich Physik und Forschungszentrum OPTIMAS, Universitaet Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Rosandi, Yudi [Fachbereich Physik und Forschungszentrum OPTIMAS, Universitaet Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Department of Physics, Universitas Padjadjaran, Jatinangor, Sumedang 45363 (Indonesia)

    2011-05-01

    Sputtering theory has existed as a mature and well-understood field of physics since the theory of collision-cascade sputtering has been developed in the late 1960s. In this presentation we outline several directions, in which the basic understanding of sputter phenomena has been challenged and new insight has been obtained recently. Sputtering of molecular solids: after ion impact on a molecular solid, not all of the impact energy is available for inducing sputtering. Part of the energy is converted into internal (rotational and vibrational) excitation of the target molecules, and part is used for molecule dissociation. Furthermore, exothermic or endothermic chemical reactions may further change the energy balance in the irradiated target. Nanoparticle desorption: usually, the flux of sputtered particles is dominated by monatomics; in the case of a pronounced spike contribution to sputtering, the contribution of clusters in the sputtered flux may become considerable. Here, we discuss the situation that nanoparticles were present on the surface, and outline mechanisms of how these may be desorbed (more or less intact) by ion or cluster impact. Rough surfaces: real surfaces are rough and contain surface defects (adatoms, surface steps, etc.). For grazing ion incidence, these influence the energy input into the surface dramatically. For such incidence angles sputtering vanishes for a flat terrace; however, ion impact close to a defect may lead to sputter yields comparable to those at normal incidence. In such cases sputtering also exhibits a pronounced azimuth and temperature dependence.

  14. Current density distributions and sputter marks in electron cyclotron resonance ion sources.

    Science.gov (United States)

    Panitzsch, Lauri; Peleikis, Thies; Böttcher, Stephan; Stalder, Michael; Wimmer-Schweingruber, Robert F

    2013-01-01

    Most electron cyclotron resonance ion sources use hexapolar magnetic fields for the radial confinement of the plasma. The geometry of this magnetic structure is then--induced by charged particles--mapped onto the inner side of the plasma electrode via sputtering and deposition. The resulting structures usually show two different patterns: a sharp triangular one in the central region which in some cases is even sputtered deep into the material (referred to as thin groove or sharp structure), and a blurred but still triangular-like one in the surroundings (referred to as broad halo). Therefore, both patterns seem to have different sources. To investigate their origins we replaced the standard plasma electrode by a custom-built plasma electrode acting as a planar, multi-segment current-detector. For different biased disc voltages, detector positions, and source biases (referred to the detector) we measured the electrical current density distributions in the plane of the plasma electrode. The results show a strong and sharply confined electron population with triangular shape surrounded by less intense and spatially less confined ions. Observed sputter- and deposition marks are related to the analysis of the results. Our measurements suggest that the two different patterns (thin and broad) indeed originate from different particle populations. The thin structures seem to be caused by the hot electron population while the broad marks seem to stem from the medium to highly charged ions. In this paper we present our measurements together with theoretical considerations and substantiate the conclusions drawn above. The validity of these results is also discussed.

  15. Influence of nitrogen admixture to argon on the ion energy distribution in reactive high power pulsed magnetron sputtering of chromium

    Science.gov (United States)

    Breilmann, W.; Maszl, C.; Hecimovic, A.; von Keudell, A.

    2017-04-01

    Reactive high power impulse magnetron sputtering (HiPIMS) of metals is of paramount importance for the deposition of various oxides, nitrides and carbides. The addition of a reactive gas such as nitrogen to an argon HiPIMS plasma with a metal target allows the formation of the corresponding metal nitride on the substrate. The addition of a reactive gas introduces new dynamics into the plasma process, such as hysteresis, target poisoning and the rarefaction of two different plasma gases. We investigate the dynamics for the deposition of chromium nitride by a reactive HiPIMS plasma using energy- and time-resolved ion mass spectrometry, fast camera measurements and temporal and spatially resolved optical emission spectroscopy. It is shown that the addition of nitrogen to the argon plasma gas significantly changes the appearance of the localized ionization zones, the so-called spokes, in HiPIMS plasmas. In addition, a very strong modulation of the metal ion flux within each HiPIMS pulse is observed, with the metal ion flux being strongly suppressed and the nitrogen molecular ion flux being strongly enhanced in the high current phase of the pulse. This behavior is explained by a stronger return effect of the sputtered metal ions in the dense plasma above the racetrack. This is best observed in a pure nitrogen plasma, because the ionization zones are mostly confined, implying a very high local plasma density and consequently also an efficient scattering process.

  16. Mechanical and structural properties of titanium dioxide deposited by innovative magnetron sputtering process

    Directory of Open Access Journals (Sweden)

    Wojcieszak Damian

    2015-09-01

    Full Text Available Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: conventional and with modulated plasma. The films were deposited on SiO2 and Si substrates. X-ray diffraction measurements of prepared coatings revealed that the films prepared using both methods were nanocrystalline. However, the coatings deposited using conventional magnetron sputtering had anatase structure, while application of sputtering with modulated plasma made possible to obtain films with rutile phase. Investigations performed with the aid of scanning electron microscope showed significant difference in the surface morphology as well as the microstructure at the thin film cross-sections. The mechanical properties of the obtained coatings were determined on the basis of nanoindentation and abrasion resistance tests. The hardness was much higher for the films with the rutile structure, while the scratch resistance was similar in both cases. Optical properties were evaluated on the basis of transmittance measurements and showed that both coatings were well transparent in a visible wavelength range. Refractive index and extinction coefficient were higher for TiO2 with rutile structure.

  17. Ionizing radiation effects on electrical and reliability characteristics of sputtered Ta2O5/Si interface

    Science.gov (United States)

    Rao, Ashwath; Verma, Ankita; Singh, B. R.

    2015-06-01

    This paper describes the effect of ionizing radiation on the interface properties of Al/Ta2O5/Si metal oxide semiconductor (MOS) capacitors using capacitance-voltage (C-V) and current-voltage (I-V) characteristics. The devices were irradiated with X-rays at different doses ranging from 100 rad to 1 Mrad. The leakage behavior, which is an important parameter for memory applications of Al/Ta2O5/Si MOS capacitors, along with interface properties such as effective oxide charges and interface trap density with and without irradiation has been investigated. Lower accumulation capacitance and shift in flat band voltage toward negative value were observed in annealed devices after exposure to radiation. The increase in interfacial oxide layer thickness after irradiation was confirmed by Rutherford Back Scattering measurement. The effect of post-deposition annealing on the electrical behavior of Ta2O5 MOS capacitors was also investigated. Improved electrical and interface properties were obtained for samples deposited in N2 ambient. The density of interface trap states (Dit) at Ta2O5/Si interface sputtered in pure argon ambient was higher compared to samples reactively sputtered in nitrogen-containing plasma. Our results show that reactive sputtering in nitrogen-containing plasma is a promising approach to improve the radiation hardness of Ta2O5/Si MOS devices.

  18. Characterization of magnetron-sputtered partially ionized deposition as a function of metal and gas species

    Energy Technology Data Exchange (ETDEWEB)

    Allain, Monica M. C. [University of Illinois, Urbana, Illinois 61801 (United States); Hayden, D. B. [University of Illinois, Urbana, Illinois 61801 (United States); Juliano, D. R. [University of Illinois, Urbana, Illinois 61801 (United States); Ruzic, D. N. [University of Illinois, Urbana, Illinois 61801 (United States)

    2000-05-01

    Conventional magnetron sputter deposition with a rf inductively coupled plasma (ICP) has demonstrated that ionized metal fluxes can be effectively utilized to fill trenches and vias with high aspect ratios. The ICP is created with a seven turn (1/2 wavelength), water cooled coil located between the magnetron cathode and the substrate. A large fraction of the metal atoms sputtered from the magnetron cathode are ionized by the ICP. These ions are accelerated across the sheath toward the substrate and deposited at normal incidence, by placing a negative bias on the substrate. A gridded energy analyzer configured with a quartz crystal microbalance is located in the center of the substrate plane to determine the ion and neutral deposition rates. While keeping the magnetron power, rf coil, target to substrate distance, pressure and diagnostic location constant, the ionization fraction was measured for two metal targets: Cu and Ti using three different working gases: Kr, Ar and Ne. Variations in target materials and working gases are shown to have an effect on ionization and deposition rates. The ionization rate is a sensitive function of the metal's ionization potential. The electron energy distribution in the plasma is affected by the sputtered metal and the working gases' ionization potential. (c) 2000 American Vacuum Society.

  19. Sputtering of the Europa surface by thermal ions from the torus and pickup ions in a diverted flow

    Science.gov (United States)

    Dols, Vincent J.; Cassidy, Timothy A.; Bagenal, Fran; Crary, Frank; Delamere, Peter A.

    2016-10-01

    Europa's atmosphere is very tenuous and is mainly composed of O2. It is thought to be produced by ion bombardment of its icy surface. Several ion populations may contribute to this sputtering:1) The thermal plasma of the torus (~ 1keV including ram velocity), which may be partially diverted around the moon by the ionospheric currents2) The energetic sulfur and hydrogen ions (~10 keV-MeV), which diffuse inward toward Europa's orbit3) and possibly the newly ionized O2 molecules that are picked up by the torus flow and hit the surface.The relative contribution of each sputtering ion population has been debated for more than three decades with estimated O2 sputtering rates varying by ~2 order of magnitude. Modelers have historically focused on a single piece of the puzzle: plasma modelers assume a static atmosphere and tend not to check that their sources and losses are consistent with their prescribed atmosphere; while atmospheric modelers neglect the electro-dynamic interaction that diverts torus plasma around the moon, and limits the ion flux to the surface.In this work, we present a first step to compute self-consistently the atmospheric production by the bombardment of the thermal plasma and pickup O2+ ions.1) We calculate the plasma flow around Europa with a MHD model2) We use this flow in a multi-species physical chemistry model of the plasma-atmosphere interaction to compute the ion fluxes into Europa's surface.3) We compute the production rate of O2 resulting from the ice sputtering by thermal and pickup ions and compare the resulting atmospheric source rate to previously published results.

  20. Effect of preliminary vacuum plasma treatment on coating adhesion

    Science.gov (United States)

    Slabodchikov, Vladimir A.; Borisov, Dmitry P.; Kuznetsov, Vladimir M.

    2016-11-01

    The paper presents research results on the adhesion properties of Si coatings synthesized by different methods and under different conditions of preliminary vacuum ion plasma treatment of substrates with subsequent magnetron sputtering. The substrate surface was pretreated with low-energy ion beams, high-energy ion beams, gas discharge plasma, and plasma produced by a magnetron sputtering system. The vacuum conditions (pump type, pressure, etc.), the ion current density, and the bias parameters (pulse repetition frequency and duration) were varied. The research results demonstrate a considerable effect of plasma immersion ion implantation on the adhesion of Si coatings to NiTi substrates.

  1. Multifunctional bulk plasma source based on discharge with electron injection

    Energy Technology Data Exchange (ETDEWEB)

    Klimov, A. S.; Medovnik, A. V. [Tomsk State University of Control Systems and Radioelectronics, Tomsk 634050 (Russian Federation); Tyunkov, A. V. [Tomsk State University of Control Systems and Radioelectronics, Tomsk 634050 (Russian Federation); Institute of High Current Electronics, Tomsk 634055 (Russian Federation); Savkin, K. P.; Shandrikov, M. V.; Vizir, A. V. [Institute of High Current Electronics, Tomsk 634055 (Russian Federation)

    2013-01-15

    A bulk plasma source, based on a high-current dc glow discharge with electron injection, is described. Electron injection and some special design features of the plasma arc emitter provide a plasma source with very long periods between maintenance down-times and a long overall lifetime. The source uses a sectioned sputter-electrode array with six individual sputter targets, each of which can be independently biased. This discharge assembly configuration provides multifunctional operation, including plasma generation from different gases (argon, nitrogen, oxygen, acetylene) and deposition of composite metal nitride and oxide coatings.

  2. Magnetron sputtering of copper on thermosensitive polymer materials of the gas centrifuge rotors

    Science.gov (United States)

    Borisevich, V.; Senchenkov, S.; Titov, D.

    2016-09-01

    Magnetron sputtering is the well-known and widely-used deposition technique for coating versatile high-quality and well-adhered films. However, the technology has some limitations, caused by high temperatures on the coating surface. The paper is devoted to the experimental development of a process of magnetron sputtering of copper on a surface coated with a thermosensitive polymer made of carbon fiber with epoxide binder. This process is applied for balancing a rotor of a gas centrifuge for isotope separation. The optimum operating parameters of the process are found and discussed. They were in quantitative agreement with data obtained by means of non-stationary modeling based on a global description of plasma in the typical geometry of the magnetron discharges obtained in independent research. The structure of the resulting layer is investigated.

  3. Magnetic properties of ZnO:Cu thin films prepared by RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Zhuo Shiyi; Xiong Yuying; Gu Min, E-mail: xiongyy@scnu.edu.c [Laboratory of Quantum Information Technology, School of Physics and Telecommunication Engineering, South China Normal University, Guangzhou 510006 (China)

    2009-05-01

    ZnO films and ZnO:Cu diluted magnetic semiconductor films were prepared by radio frequency magnetron sputtering on Si (111) substrates, with targets of ZnO and Zn{sub 0.99}Cu{sub 0.01}O, respectively. The plasma emission spectra were analyzed by using a grating monochromator during sputtering. The X-ray photoelectron spectroscopy measurements indicate the existence of Zni defect in the films, and the valence state of Cu is 1+. The X-ray diffraction measurements indicate that the thin films have a hexagonal wurtzite structure and have a preferred orientation along the c-axis. The vibrating sample magnetometer measurements indicate that the sample is ferromagnetic at room temperature, and the origin of the magnetic behavior of the samples is discussed.

  4. Sputtered iridium oxide films (SIROFs) for low-impedance neural stimulation and recording electrodes.

    Science.gov (United States)

    Cogan, S F; Plante, T D; Ehrlich, J

    2004-01-01

    Iridium oxide films formed by electrochemical activation of iridium metal (AIROF) or by electrochemical deposition (EIROF) are being evaluated as low-impedance charge-injection coatings for neural stimulation and recording. Iridium oxide may also be deposited by reactive sputtering from iridium metal in an oxidizing plasma. The characterization of sputtered iridium oxide films (SIROFs) as coatings for nerve electrodes is reported. SIROFs were characterized by cyclic voltammetry, electrochemical impedance spectroscopy, and potential transient measurements during charge-injection. The surface morphology of the SIROF transitions from smooth to highly nodular with increasing film thickness from 80 nm to 4600 nm. Charge-injection capacities exceed 0.75 mC/cm(2) with 0.75 ms current pulses in thicker films. The SIROF was deposited on both planar and non-planar substrates and photolithographically patterned by lift-off.

  5. Magnetic properties of FeCoC thin films prepared by various sputtering methods

    Energy Technology Data Exchange (ETDEWEB)

    Edon, V; Dubourg, S [CEA, DAM, LE RIPAULT, F-37260 Monts (France); Vernieres, J; Bobo, J-F, E-mail: sebastien.dubourg@cea.fr [LNMH-CEMES-CNRS-ONERA, F-31055 Toulouse (France)

    2011-07-06

    In order to grow nanocrystallized soft magnetic thin films, FeCoC alloys were first deposited by reactive sputtering in Ar/C{sub 2}H{sub 2} plasma. This deposition process rendered it possible to incorporate a carbon content between 0 and 30 at.% into the FeCo samples. The films were then compared to FeCoC samples obtained from a Fe{sub 65}Co{sub 35}/C composite target, with an adjustable amount of C slots. Layers with soft magnetic properties were achieved when increasing the C{sub 2}H{sub 2} rate during the reactive deposition, whereas films deposited by sputtering of FeCo and C on the same target demonstrated a very high coercivity. Permeability spectra measurements (and published elsewhere) demonstrated that FeCoC prepared with acetylene is a very promising material for high-frequency magnetic devices.

  6. Improved adherence of sputtered titanium carbide coatings on nickel- and titanium-base alloys

    Science.gov (United States)

    Wheeler, D. R.; Brainard, W. A.

    1979-01-01

    Rene 41 and Ti-6Al-4V alloys were radio frequency sputter coated with titanium carbide by several techniques in order to determine the most effective. Coatings were evaluated in pin-on-disk tests. Surface analysis by X-ray photoelectron spectroscopy was used to relate adherence to interfacial chemistry. For Rene 41, good coating adherence was obtained when a small amount of acetylene was added to the sputtering plasma. The acetylene carburized the alloy surface and resulted in better bonding to the TiC coating. For Ti-6Al-4V, the best adherence and wear protection was obtained when a pure titanium interlayer was used between the coating and the alloy. The interlayer is thought to prevent the formation of a brittle, fracture-prone, aluminum oxide layer.

  7. Magnetic properties of ZnO:Cu thin films prepared by RF magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    Zhuo Shiyi; Xiong Yuying; Gu Min

    2009-01-01

    ZnO films and ZnO:Cu diluted magnetic semiconductor films were prepared by radio frequency magnetron sputtering on Si (111) substrates, with targets of ZnO and Zn0.99Cu0.01 O, respectively. The plasma emission spectra were analyzed by using a grating monochromator during sputtering. The X-ray photoelectron spectroscopy measurements indicate the existence of Zni defect in the films, and the valence state of Cu is 1. The X-ray diffraction measurements indicate that the thin films have a hexagonal wurtzite structure and have a preferred orientation along the c-axis. The vibrating sample magnetometer measurements indicate that the sample is ferromagnetic at room temperature, and the origin of the magnetic behavior of the samples is discussed.

  8. Menorrhagia (Heavy Menstrual Bleeding)

    Science.gov (United States)

    Diseases and Conditions Menorrhagia (heavy menstrual bleeding) By Mayo Clinic Staff Menorrhagia is the medical term for menstrual periods with abnormally heavy or prolonged bleeding. Although heavy ...

  9. Compositional analysis of polycrystalline hafnium oxide thin films by heavy-ion elastic recoil detection analysis

    Energy Technology Data Exchange (ETDEWEB)

    Martinez, F.L. [Departamento de Electronica y Tecnologia de Computadoras, Universidad Politecnica de Cartagena, Campus Universitario Muralla del Mar, E-30202 Cartagena (Spain)]. E-mail: Felix.Martinez@upct.es; Toledano, M. [Departamento de Fisica Aplicada III, Universidad Complutense de Madrid, E-28025 Madrid (Spain); San Andres, E. [Departamento de Fisica Aplicada III, Universidad Complutense de Madrid, E-28025 Madrid (Spain); Martil, I. [Departamento de Fisica Aplicada III, Universidad Complutense de Madrid, E-28025 Madrid (Spain); Gonzalez-Diaz, G. [Departamento de Fisica Aplicada III, Universidad Complutense de Madrid, E-28025 Madrid (Spain); Bohne, W. [Hahn-Meitner-Institut Berlin, Abteilung SF-4, D-14109 Berlin (Germany); Roehrich, J. [Hahn-Meitner-Institut Berlin, Abteilung SF-4, D-14109 Berlin (Germany); Strub, E. [Hahn-Meitner-Institut Berlin, Abteilung SF-4, D-14109 Berlin (Germany)

    2006-10-25

    The composition of polycrystalline hafnium oxide thin films has been measured by heavy-ion elastic recoil detection analysis (HI-ERDA). The films were deposited by high-pressure reactive sputtering (HPRS) on silicon wafers using an oxygen plasma at pressures between 0.8 and 1.6 mbar and during deposition times between 0.5 and 3.0 h. Hydrogen was found to be the main impurity and its concentration increased with deposition pressure. The composition was always slightly oxygen-rich, which is attributed to the oxygen plasma. Additionally, an interfacial silicon oxide thin layer was detected and taken into account. The thickness of the hafnium oxide film was found to increase linearly with deposition time and to decrease exponentially with deposition pressure, whereas the thickness of the silicon oxide interfacial layer has a minimum as a function of pressure at around 1.2 mbar and increases slightly as a function of time. The measurements confirmed that this interfacial layer is formed mainly during the early stages of the deposition process.

  10. The Effect of a Single Session of Moderate and Heavy Intensity Weight-lifting Exercise on Plasma Testosterone and Cortisol in Elite Male Weight-lifters

    Directory of Open Access Journals (Sweden)

    Seyed Morteza Tayebi

    2013-03-01

    Full Text Available The aim of this study was effect of a single session of weight-lifting exercise on serum testosterone and cortisol and testosterone-cortisol ratio changes in elite weight-lifter of Mazandaran state. 10 elite weight-lifter of Mazandaran state was selected randomly. Moderate-intensity exercise was contained stand snatch (2 sets with 3 repeats of 60 one repeat maximum, Olympic snatch (2 sets with 2 repeats of 60 1RM and 1 sets with 2 repeats of 70 1RM, Olympic clean & jerk (2 sets with 2 repeats of 60 1RM and 1 sets with 2 repeats of 70 1RM, squat on chest (2 sets with 3 repeats of 70 1RM; and heavy-intensity exercise was contained Olympic snatch (idoneous warm up and reach to %100 of record, Olympic clean & jerk (idoneous warm up and reach to %100 of record, mean lift (2 sets with 3 repeat of %120 Olympic snatch record, squat on chest (idoneous warm up and reach to %100 of record. Blood samples were taken at 30 minutes previous and immediately post exercise while the subjects were overnight fast (at least 12h. Blood variables were measurement containing Hemoglobin, heamatocrit, Testosterone and cortisol. Data were analyzed by spss program and paired sample t-test was used to compare mean of previous and Post of information. Finally any significant changes were not observed in blood variables not only in moderate-intensity exercise but also in heavy-intensity exercise. Insignificant changes in testosterone, cortisol and testosterone-cortisol ratio may be accounted as exercise performance time and fitness level of weightlifters.

  11. Sputter coating of microspherical substrates by levitation

    Science.gov (United States)

    Lowe, A.T.; Hosford, C.D.

    Microspheres are substantially uniformly coated with metals or nonmetals by simltaneously levitating them and sputter coating them at total chamber pressures less than 1 torr. A collimated hole structure comprising a parallel array of upwardly projecting individual gas outlets is machined out to form a dimple. Glass microballoons,, which are particularly useful in laser fusion applications, can be substantially uniformly coated using the coating method and apparatus.

  12. Heavy Ion Acceleration in Impulsive Solar Flares

    Institute of Scientific and Technical Information of China (English)

    王德焴

    2002-01-01

    The abundance enhancements of heavy ions Ne, Mg, Si and Fe in impulsive solar energetic particle (SEP) eventsare explained by a plasma acceleration mechanism. In consideration of the fact that the coronal plasma is mainlycomposed of hydrogen and helium ions, we think that theion-ion hybrid wave and quasi-perpendicular wave can.be excited by the energetic electron beam in impulsive solar flares. These waves may resonantly be absorbed byheavy ions when the frequencies of these waves are close to the second-harmonic gyrofrequencies of these heavyions. This requires the coronal plasma temperature to be located in the range ofT ~ (5 - 9) × 106 K in impulsivesolar flares and makes the average ionic charge state of these heavy ions in impulsive SEP events higher than theaverage ionic charge state of these heavy ions in gradual SEP events. These pre-heated and enhanced heavy ionsin impulsive SEP events.

  13. Flexible Al-doped ZnO films grown on PET substrates using linear facing target sputtering for flexible OLEDs

    Energy Technology Data Exchange (ETDEWEB)

    Jeong, Jin-A; Shin, Hyun-Su; Choi, Kwang-Hyuk; Kim, Han-Ki, E-mail: imdlhkkim@khu.ac.k [Information Materials and Device Laboratory (IMDL), Department of Advanced Materials Engineering for Information and Electronics, Kyung Hee University, 1 Seocheon-dong, Yongin-si, Gyeonggi-do, 446-701 (Korea, Republic of)

    2010-11-24

    We report the characteristics of flexible Al-doped zinc oxide (AZO) films prepared by a plasma damage-free linear facing target sputtering (LFTS) system on PET substrates for use as a flexible transparent conducting electrode in flexible organic light-emitting diodes (OLEDs). The electrical, optical and structural properties of LFTS-grown flexible AZO electrodes were investigated as a function of dc power. We obtained a flexible AZO film with a sheet resistance of 39 {Omega}/{open_square} and an average transmittance of 84.86% in the visible range although it was sputtered at room temperature without activation of the Al dopant. Due to the effective confinement of the high-density plasma between the facing AZO targets, the AZO film was deposited on the PET substrate without plasma damage and substrate heating caused by bombardment of energy particles. Moreover, the flexible OLED fabricated on the AZO/PET substrate showed performance similar to the OLED fabricated on a ITO/PET substrate in spite of a lower work function. This indicates that LFTS is a promising plasma damage-free and low-temperature sputtering technique for deposition of flexible and indium-free AZO electrodes for use in cost-efficient flexible OLEDs.

  14. Sputtering of copper atoms by keV atomic and molecular ions A comparison of experiment with analytical and computer based models

    CERN Document Server

    Gillen, D R; Goelich,

    2002-01-01

    Non-resonant multiphoton ionisation combined with quadrupole and time-of-flight analysis has been used to measure energy distributions of sputtered copper atoms. The sputtering of a polycrystalline copper target by 3.6 keV Ar sup + , N sup + and CF sub 2 sup + and 1.8 keV N sup + and CF sub 2 sup + ion bombardment at 45 deg. has been investigated. The linear collision model in the isotropic limit fails to describe the high energy tail of the energy distributions. However the TRIM.SP computer simulation has been shown to provide a good description. The results indicate that an accurate description of sputtering by low energy, molecular ions requires the use of computer simulation rather than analytical approaches. This is particularly important when considering plasma-surface interactions in plasma etching and deposition systems.

  15. Assessment of the effects of scrape-off layer fluctuations on first wall sputtering with the TOKAM-2D turbulence code

    Science.gov (United States)

    Marandet, Y.; Nace, N.; Valentinuzzi, M.; Tamain, P.; Bufferand, H.; Ciraolo, G.; Genesio, P.; Mellet, N.

    2016-11-01

    Plasma material interactions on the first wall of future tokamaks such as ITER and DEMO are likely to play an important role, because of turbulent radial transport. The latter results to a large extent from the radial propagation of plasma filaments through a tenuous background. In such a situation, mean field descriptions (on which transport codes rely) become questionable. First wall sputtering is of particular interest, especially in a full W machine, since it has been shown experimentally that first wall sources control core contamination. In ITER, beryllium sources will be one of the important actors in determining the fuel retention level through codeposition. In this work, we study the effect of turbulent fluctuations on mean sputtering yields and fluxes, relying on a new version of the TOKAM-2D code which includes ion temperature fluctuations. We show that fluctuations enhance sputtering at sub-threshold impact energies, by more than an order of magnitude when fluctuation levels are of order unity.

  16. Characterisation of laser induced thermal radiation for the experimental investigation of heavy ion interactions with plasma; Charakterisierung lasererzeugter Hohlraumstrahlung fuer die experimentelle Untersuchung der Wechselwirkung von Schwerionen mit Plasmen

    Energy Technology Data Exchange (ETDEWEB)

    Hessling, Thomas

    2010-02-08

    One major area of interest of the plasma physics group at the GSI Helmholtzzentrum fuer Schwerionenforschung GmbH (GSI Helmholtz Centre for Heavy Ion Research) and the laser and plasma physics group at the Institut fuer Kernphysik (Nuclear Physics Institute) of the University of Technology Darmstadt is the determination of the energy loss of heavy ions in plasma. The experimental area Z6 at GSI offers the unique opportunity for this in the combination of the ion accelerator UNILAC with two high energy laser systems: nhelix and PHELIX. In recent experiments a thin carbon foil is probed by regular ion bunches every 9.2 ns. A laser pulse of one or both of the laser systems heats the foil to the plasma state at a certain time. The change in arrival time of each ion bunch at a stop detector allows to determine the energy loss in the plasma. In addition to this experimental scheme with a directly heated foil a different scheme with indirectly heated targets is investigated. The laser is unable to penetrate the foil and thus deposits its energy on the surface, leading to gradients in density and temperature. In the indirectly heated set-up the laser energy is converted into thermal X-Rays in a converter hohlraum. A secondary cavity, containing the interaction target for the ion beam, is attached to the converter and heated homogeneously by the X-Rays. In the present work the thermal radiation from a converter cavity with a diameter of either 750 m or 650 m was investigated. The frequency-doubled nhelix beam (532 nm wavelength) with energies of up to 30 joules in six to seven nanoseconds (FWHM) was used as the heating laser. A new diode spectrometer, specifically designed for the temperature measurement, recorded the absolute radiation intensity at four different wavelengths and resolved the temperature evolution during the heating phase. Maximum values between 32 eV and 38 eV have been determined in various measurements. In addition to the temporal characterisation the

  17. SPUTTERING FROM A POROUS MATERIAL BY PENETRATING IONS

    Energy Technology Data Exchange (ETDEWEB)

    Rodriguez-Nieva, J. F. [Instituto Balseiro, Universidad Nacional de Cuyo, 8400 Bariloche (Argentina); Bringa, E. M. [CONICET and Instituto de Ciencias Basicas, Universidad Nacional de Cuyo, 5500 Mendoza (Argentina); Cassidy, T. A. [CalTech/JPL, Pasadena, CA 91109 (United States); Johnson, R. E.; Fama, M.; Baragiola, R. A. [Laboratory for Atomic and Surface Physics, University of Virginia, Charlottesville, VA 22903 (United States); Caro, A. [Los Alamos National Laboratory, Los Alamos, NM 94551 (United States); Loeffler, M. J. [NASA Goddard Space Flight Center, Astrochemistry Branch, Code 691, Greenbelt, MD 20771 (United States); Farkas, D. [Department of Materials Sciences, Virginia Tech, Blacksburg, VA 24061 (United States)

    2011-12-10

    Porous materials are ubiquitous in the universe and weathering of porous surfaces plays an important role in the evolution of planetary and interstellar materials. Sputtering of porous solids in particular can influence atmosphere formation, surface reflectivity, and the production of the ambient gas around materials in space. Several previous studies and models have shown a large reduction in the sputtering of a porous solid compared to the sputtering of the non-porous solid. Using molecular dynamics simulations we study the sputtering of a nanoporous solid with 55% of the solid density. We calculate the electronic sputtering induced by a fast, penetrating ion, using a thermal spike representation of the deposited energy. We find that sputtering for this porous solid is, surprisingly, the same as that for a full-density solid, even though the sticking coefficient is high.

  18. Sputtering from a Porous Material by Penetrating Ions

    Science.gov (United States)

    Rodriguez-Nieva, J. F.; Bringa, E. M.; Cassidy, T. A.; Johnson, R. E.; Caro, A.; Fama, M.; Loeffler, M. J.; Baragiola, R. A.; Farkas, D.

    2011-12-01

    Porous materials are ubiquitous in the universe and weathering of porous surfaces plays an important role in the evolution of planetary and interstellar materials. Sputtering of porous solids in particular can influence atmosphere formation, surface reflectivity, and the production of the ambient gas around materials in space. Several previous studies and models have shown a large reduction in the sputtering of a porous solid compared to the sputtering of the non-porous solid. Using molecular dynamics simulations we study the sputtering of a nanoporous solid with 55% of the solid density. We calculate the electronic sputtering induced by a fast, penetrating ion, using a thermal spike representation of the deposited energy. We find that sputtering for this porous solid is, surprisingly, the same as that for a full-density solid, even though the sticking coefficient is high.

  19. The sputter cross section of a surface-vacancy island

    Energy Technology Data Exchange (ETDEWEB)

    Rosandi, Yudi, E-mail: rosandi@physik.uni-kl.de [Department of Physics, Universitas Padjadjaran, Jatinangor, Sumedang 45363 (Indonesia); Fachbereich Physik und Forschungszentrum OPTIMAS, Universitaet Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.de [Fachbereich Physik und Forschungszentrum OPTIMAS, Universitaet Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany)

    2011-07-15

    Using molecular-dynamics simulation we investigate the effect of surface-vacancy islands on ion-induced sputtering. As an exemplary case, the sputtering of a Pt(1 1 1) surface by 5 keV Ar{sup +} ions incident at 83{sup o} towards the surface normal is investigated. We find that only the ascending step of the island induces sputtering. Wide vacancy islands exhibit the direct-hit, indirect-hit and channeling zones previously identified for surface steps and adatom islands. A special role is played by the descending step edge. Even though it is not sputtered itself, it deflects ion trajectories and may direct them to the ascending step edge thus enhancing sputtering. We derive a simple criterion based on the shadow cone of the descending step to decide whether a vacancy island contributes to sputtering or not.

  20. GaAs Films Prepared by RF-Magnetron Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    L.H. Ouyang; D.L. Rode; T. Zulkifli; B. Abraham-Shrauner; N. Lewis; M.R. Freeman

    2001-08-01

    The authors reported on the optical absorption, adhesion, and microstructure of RF-magnetron sputtered films of hydrogenated amorphous and microcrystalline GaAs films for the 1 to 25 {micro}m infrared wavelength rate. Sputtering parameters which were varied include sputtering power, temperature and pressure, and hydrogen sputtering-gas concentration. TEM results show a sharp transition from purely amorphous GaAs to a mixture of microcrystalline GaAs in an amorphous matrix at 34 {+-} 2 C. By optimizing the sputtering parameters, the optical absorption coefficient can be decreased below 100 cm{sup -1} for wavelengths greater than about 1.25 {micro}m. These results represent the lowest reported values of optical absorption for sputtered films of GaAs directly measured by spectrophotometry for the near-infrared wavelength region.

  1. Fluidized Bed Sputtering for Particle and Powder Metallization

    Science.gov (United States)

    2013-04-01

    Fluidized Bed Sputtering for Particle and Powder Metallization by Daniel M. Baechle, J. Derek Demaree, James K. Hirvonen, and Eric D...5069 ARL-TR-6435 April 2013 Fluidized Bed Sputtering for Particle and Powder Metallization Daniel M. Baechle, J. Derek Demaree, James K...YYYY) April 2013 2. REPORT TYPE Final 3. DATES COVERED (From - To) June 2008–June 2012 4. TITLE AND SUBTITLE Fluidized Bed Sputtering for

  2. A deep survey of heavy element lines in planetary nebulae -- II. Recombination line abundances and evidence for ultra-cold plasma

    CERN Document Server

    Tsamis, Y G; Liu, X W; Storey, P J; Danziger, I J

    2004-01-01

    [Abridged] Deep optical observations of the spectra of 12 Galactic planetary nebulae (PNe) and 3 Magellanic Cloud PNe were presented in Paper I by Tsamis et al. (2003b), who carried out an abundance analysis using the collisionally excited forbidden lines. Here, the relative intensities of faint optical recombination lines (ORLs) from ions of carbon, nitrogen and oxygen are analysed in order to derive the abundances of these ions relative to hydrogen. We define an abundance discrepancy factor (ADF) as the ratio of the abundance derived for a heavy element ion from its recombination lines to that derived for the same ion from its ultraviolet, optical or infrared collisionally excited lines (CELs). All of the PNe in our sample are found to have ADF's that exceed unity. There is no dependence of the magnitude of the ADF upon the excitation energy of the UV, optical or IR CEL transition used, indicating that classical nebular temperature fluctuations--i.e. in a chemically homogeneous medium--are not the cause of ...

  3. Simulation and experimental study on compositional evolution of Li-Co in LiCoO2 thin films during sputter deposition

    Science.gov (United States)

    Nimisha, C. S.; Mohan Rao, G.

    2011-06-01

    The compositional evolution in sputter deposited LiCoO2 thin films is influenced by process parameters involved during deposition. The electrochemical performance of these films strongly depends on their microstructure, preferential orientation and stoichiometry. The transport process of sputtered Li and Co atoms from the LiCoO2 target to the substrate, through Ar plasma in a planar magnetron configuration, was investigated based on the Monte Carlo technique. The effect of sputtering gas pressure and the substrate-target distance (dst) on Li/Co ratio, as well as, energy and angular distribution of sputtered atoms on the substrate were examined. Stable Li/Co ratios have been obtained at 5 Pa pressure and dst in the range 5-11 cm. The kinetic energy and incident angular distribution of Li and Co atoms reaching the substrate have been found to be dependent on sputtering pressure. Simulations were extended to predict compositional variations in films prepared at various process conditions. These results were compared with the composition of films determined experimentally using x-ray photoelectron spectroscopy (XPS). Li/Co ratio calculated using XPS was in moderate agreement with that of the simulated value. The measured film thickness followed the same trend as predicted by simulation. These studies are shown to be useful in understanding the complexities in multicomponent sputtering.

  4. Modeling and stability analysis of the nonlinear reactive sputtering process

    Directory of Open Access Journals (Sweden)

    György Katalin

    2011-12-01

    Full Text Available The model of the reactive sputtering process has been determined from the dynamic equilibrium of the reactive gas inside the chamber and the dynamic equilibrium of the sputtered metal atoms which form the compound with the reactive gas atoms on the surface of the substrate. The analytically obtained dynamical model is a system of nonlinear differential equations which can result in a histeresis-type input/output nonlinearity. The reactive sputtering process has been simulated by integrating these differential equations. Linearization has been applied for classical analysis of the sputtering process and control system design.

  5. Sputtering materials for VLSI and thin film devices

    CERN Document Server

    Sarkar, Jaydeep

    2010-01-01

    An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall p

  6. Lifetime dependence of nitrided carbon stripper foils on sputter angle during N{sup +} ion beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Sugai, I., E-mail: isao.Sugai@kek.jp [High Energy Accelerator Research Organization, Accelerator Laboratory, Oho 1-1, Tsukuba, Ibaraki 305-0801 (Japan); Oyaizu, M. [High Energy Accelerator Research Organization, Institute of Particle and Nuclear Studies, Oho 1-1, Tsukuba, Ibaraki 305-0801 (Japan); Takeda, Y. [High Energy Accelerator Research Organization, Accelerator Laboratory, Oho 1-1, Tsukuba, Ibaraki 305-0801 (Japan); Kawakami, H. [High Energy Accelerator Research Organization, Institute of Particle and Nuclear Studies, Oho 1-1, Tsukuba, Ibaraki 305-0801 (Japan); Kawasaki, K.; Hattori, T. [Department of Physics, Tokyo Institute of Technology, Ohokayama, Meguro, Tokyo 152-8550 (Japan); Kadono, T. [Department of Physics, University of Tokyo, Hongo, 7-3-1, Bunkyo, Tokyo 113-0033 (Japan)

    2015-09-01

    We fabricated high-lifetime thin nitride carbon stripper (NCS) foils with high nitrogen contents using ion-beam sputtering with reactive nitrogen gas and investigated the dependence of their lifetimes on the sputter angle. The nitrogen in carbon foils plays a critical role in determining their lifetime. Therefore, in order to investigate the effects of the nitrogen level in NCS foils on foil lifetime, we measured the sputtering yield for different sputter angles at a sputtering voltage of 10 kV while using carbon-based targets. We also measured the nitrogen-to-carbon thickness ratios of the foils using Rutherford backscattering spectrometry. The foils made at a sputter angle of 15° using a glassy amorphous carbon target exhibited an average increase of 200-fold in lifetime when compared to commercially available foils.

  7. Heavy-Ion-Induced Electronic Desorption of Gas from Metals

    CERN Document Server

    Molvik, A W; Mahner, E; Kireeff Covo, M; Bellachioma, M C; Bender, M; Bieniosek, F M; Hedlund, E; Krämer, A; Kwan, J; Malyshev, O B; Prost, L; Seidl, P A; Westenskow, G; Westerberg, L

    2007-01-01

    During heavy-ion operation in several particle accelerators worldwide, dynamic pressure rises of orders of magnitude were triggered by lost beam ions that bombarded the vacuum chamber walls. This ion-induced molecular desorption, observed at CERN, GSI, and BNL, can seriously limit the ion beam lifetime and intensity of the accelerator. From dedicated test stand experiments we have discovered that heavy-ion-induced gas desorption scales with the electronic energy loss (dEe/dx) of the ions slowing down in matter; but it varies only little with the ion impact angle, unlike electronic sputtering.

  8. Heavy-ion induced electronic desorption of gas from metals

    Energy Technology Data Exchange (ETDEWEB)

    Molvik, A W; Kollmus, H; Mahner, E; Covo, M K; Bellachioma, M C; Bender, M; Bieniosek, F M; Hedlund, E; Kramer, A; Kwan, J; Malyshev, O B; Prost, L; Seidl, P A; Westenskow, G; Westerberg, L

    2006-12-19

    During heavy ion operation in several particle accelerators world-wide, dynamic pressure rises of orders of magnitude were triggered by lost beam ions that bombarded the vacuum chamber walls. This ion-induced molecular desorption, observed at CERN, GSI, and BNL, can seriously limit the ion beam lifetime and intensity of the accelerator. From dedicated test stand experiments we have discovered that heavy-ion induced gas desorption scales with the electronic energy loss (dE{sub e}/d/dx) of the ions slowing down in matter; but it varies only little with the ion impact angle, unlike electronic sputtering.

  9. Investigation of heavy-metal accumulation in selected plant samples using laser induced breakdown spectroscopy and laser ablation inductively coupled plasma mass spectrometry

    Science.gov (United States)

    Galiová, M.; Kaiser, J.; Novotný, K.; Novotný, J.; Vaculovič, T.; Liška, M.; Malina, R.; Stejskal, K.; Adam, V.; Kizek, R.

    2008-12-01

    Single-pulse Laser-Induced Breakdown Spectroscopy (LIBS) and Laser-Ablation Inductively Coupled Plasma Mass-Spectrometry (LA-ICP-MS) were applied for mapping the silver and copper distribution in Helianthus Annuus L. samples treated with contaminant in controlled conditions. For Ag and Cu detection the 328.07 nm Ag(I) and 324.75 nm Cu(I) lines were used, respectively. The LIBS experimental conditions (mainly the laser energy and the observation window) were optimized in order to avoid self-absorption effect in the measured spectra. In the LA-ICP-MS analysis the Ag 107 and Cu 63 isotopes were detected. The capability of these two analytical techniques for high-resolution mapping of selected trace chemical elements was demonstrated.

  10. Crescimento de filmes finos cristalinos de dióxido de titânio por sistemas magnetron sputtering.

    OpenAIRE

    Diego Alexandre Duarte

    2010-01-01

    Nesse trabalho é reportado o crescimento de filmes finos de dióxido de titânio (TiO2) por duas técnicas assistidas a plasma chamadas magnetron sputtering convencional (MSC) e magnetron sputtering catodo oco (MSCO). O dióxido de titânio foi crescido sobre substratos de silício, variando alguns parâmetros de plasma como, por exemplo, a distância axial (z0) e a concentração de oxigênio na mistura Ar+O2. As amostras foram caracterizadas por perfilometria, microscopia de força atômica (MFA) e difr...

  11. Simulation of tungsten sputtering with EDGE2D–EIRENE in low triangularity L-mode JET ITER like wall configuration

    NARCIS (Netherlands)

    Harting, D.; Groth, M.; Beurskens, M.; Boerner, P.; Brix, M.; Coenen, J. W.; Corrigan, G.; Lehnen, M.; Marsen, S.; van Rooij, G. J.; Reiter, D.; Wiesen, S.

    2013-01-01

    The 2D edge plasma transport code EDGE2D-EIRENE has been upgraded to account for the actual material and geometric properties of the newly installed İTER\\} like wall (ILW) at JET. This includes the simulation of beryllium and tungsten impurities as well as a revised treatment of sputtering by main p

  12. Effect of process parameters on mechanical and tribological performance of pulsed-DC sputtered TiC/a-C : H nanocomposite films

    NARCIS (Netherlands)

    Shaha, K.P.; Pei, Y.T.; Martinez-Martinez, D.; Sanchez-Lopez, J.C.; Hosson, J.Th.M. De

    2010-01-01

    Mechanical, structural, chemical bonding (sp(3)/sp(2)). and tribological properties of films deposited by pulsed-DC sputtering of Ti targets in Ar/C2H2 plasma were studied as a function of the substrate bias voltage, Ti-target current, C2H2 flow rate and pulse frequency by nanoindentation, Raman spe

  13. Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?

    Science.gov (United States)

    Strijckmans, K.; Moens, F.; Depla, D.

    2017-02-01

    This paper discusses a few mechanisms that can assist to answer the title question. The initial approach is to use an established model for DC magnetron sputter deposition, i.e., RSD2013. Based on this model, the impact on the hysteresis behaviour of some typical HiPIMS conditions is investigated. From this first study, it becomes clear that the probability to observe hysteresis is much lower as compared to DC magnetron sputtering. The high current pulses cannot explain the hysteresis reduction. Total pressure and material choice make the abrupt changes less pronounced, but the implantation of ionized metal atoms that return to the target seems to be the major cause. To further substantiate these results, the analytical reactive sputtering model is coupled with a published global plasma model. The effect of metal ion implantation is confirmed. Another suggested mechanism, i.e., gas rarefaction, can be ruled out to explain the hysteresis reduction. But perhaps the major conclusion is that at present, there are too little experimental data available to make fully sound conclusions.

  14. Preparation and comparison of a-C:H coatings using reactive sputter techniques

    Energy Technology Data Exchange (ETDEWEB)

    Keunecke, M., E-mail: martin.keunecke@ist.fraunhofer.d [Fraunhofer Institute for Surface Engineering and Thin Films (IST), Braunschweig (Germany); Weigel, K.; Bewilogua, K. [Fraunhofer Institute for Surface Engineering and Thin Films (IST), Braunschweig (Germany); Cremer, R.; Fuss, H.-G. [CemeCon AG, Wuerselen (Germany)

    2009-12-31

    Amorphous hydrogenated carbon (a-C:H) coatings are widely used in several industrial applications. These coatings commonly will be prepared by plasma activated chemical vapor deposition (PACVD). The main method used to prepare a-C:H coating in industrial scale is based on a glow discharge in a hydrocarbon gas like acetylene or methane using a substrate electrode powered with medium frequency (m.f. - some 10 to 300 kHz). Some aims of further development are adhesion improvement, increase of hardness and high coating quality on complex geometries. A relatively new and promising technique to fulfil these requirements is the deposition of a-C:H coatings by a reactive d.c. magnetron sputter deposition from a graphite target with acetylene as reactive gas. An advancement of this technique is the deposition in a pulsed magnetron sputter process. Using these three mentioned techniques a-C:H coatings were prepared in the same deposition machine. For adhesion improvement different interlayer systems were applied. The effect of different substrate bias voltages (d.c. and d.c. pulse) was investigated. By applying the magnetron sputter technique in the d.c. pulse mode, plastic hardness values up to 40 GPa could be reached. Besides hardness other mechanical properties like resistance against abrasive wear were measured and compared. Cross sectional SEM images showed the growth structure of the coatings.

  15. Reactive magnetron sputter deposition of superconducting niobium titanium nitride thin films with different target sizes

    CERN Document Server

    Bos, B G C; Haalebos, E A F; Gimbel, P M L; Klapwijk, T M; Baselmans, J J A; Endo, A

    2016-01-01

    The superconducting critical temperature (Tc>15 K) of niobium titanium nitride (NbTiN) thin films allows for low-loss circuits up to 1.1 THz, enabling on-chip spectroscopy and multi-pixel imaging with advanced detectors. The drive for large scale detector microchips is demanding NbTiN films with uniform properties over an increasingly larger area. This article provides an experimental comparison between two reactive d.c. sputter systems with different target sizes: a small target (100 mm diameter) system and a large target (127 mm x 444.5 mm) one, with the aim of improving the film uniformity using the large target system. We focus on the Tc of the films and I-V characteristics of the sputter plasma, and we find that both systems are capable of depositing films with Tc>15 K. We find that these films are deposited within the transition from metallic to compound sputtering, at the point where target nitridation most strongly depends on nitrogen flow. Key in the deposition optimization is to increase the system'...

  16. Physical processes in directed ion beam sputtering. Ph.D. Thesis

    Science.gov (United States)

    Robinson, R. S.

    1979-01-01

    The general operation of a discharge chamber for the production of ions is described. A model is presented for the magnetic containment of both primary and secondary or Maxwellian electrons in the discharge plasma. Cross sections were calculated for energy and momentum transfer in binary collisions between like pairs of Ar, Kr, and Xe atoms in the energy range from about 1 eV to 1000 eV. These calculations were made from available pair interaction potentials using a classical model. Experimental data from the literature were fit to a theoretical expression for the Ar resonance charge exchange cross section over the same energy range. A model was developed that describes the processes of conical texturing of a surface due to simultaneous directed ion beam etching and sputter deposition of an impurity material. This model accurately predicts both a minimum temperature for texturing to take place and the variation of cone density with temperature. It also provides the correct order of magnitude of cone separation. It was predicted from the model, and subsequently verified experimentally, that a high sputter yield material could serve as a seed for coning of a lower sputter yield substrate. Seeding geometries and seed deposition rates were studied to obtain an important input to the theoretical texturing model.

  17. The Effect of Ion Current Density on Target Etching in Radio Frequency-Magnetron Sputtering Process

    Institute of Scientific and Technical Information of China (English)

    王庆; 王永富; 巴德纯; 岳向吉

    2012-01-01

    The effect of ion current density of argon plasma on target sputtering in magnetron sputtering process was investigated. Using home-made ion probe with computer-based data acquisition system, the ion current density as functions of discharge power, gas pressure and positions was measured. A double-hump shape was found in ion current density curve after the analysis of the effects of power and pressure. The data demonstrate that ion current density increases with the increase in gas pressure in spite of slightly at the double-hump site, sharply at wave-trough and side positions. Simultaneously, the ion current density increases upon increase in power. Es- pecially, the ion current density steeply increases at the double-hump site. The highest energy of the secondary electrons arising from Larmor precession was found at the double-hump position, which results in high ion density. The target was etched seriously at the double-hump position due to the high ion density there. The data indicates that the increase in power can lead to a high sputtering speed rate.

  18. Study on the effect of hydrogen addition on the variation of plasma parameters of argon-oxygen magnetron glow discharge for synthesis of TiO2 films

    Directory of Open Access Journals (Sweden)

    Partha Saikia

    2016-04-01

    Full Text Available We report the effect of hydrogen addition on plasma parameters of argon-oxygen magnetron glow discharge plasma in the synthesis of H-doped TiO2 films. The parameters of the hydrogen-added Ar/O2 plasma influence the properties and the structural phases of the deposited TiO2 film. Therefore, the variation of plasma parameters such as electron temperature (Te, electron density (ne, ion density (ni, degree of ionization of Ar and degree of dissociation of H2 as a function of hydrogen content in the discharge is studied. Langmuir probe and Optical emission spectroscopy are used to characterize the plasma. On the basis of the different reactions in the gas phase of the magnetron discharge, the variation of plasma parameters and sputtering rate are explained. It is observed that the electron and heavy ion density decline with gradual addition of hydrogen in the discharge. Hydrogen addition significantly changes the degree of ionization of Ar which influences the structural phases of the TiO2 film.

  19. Silica-sandwiched Au nanoparticle arrays by a soft PE-CVD/RF sputtering approach

    Energy Technology Data Exchange (ETDEWEB)

    Barreca, Davide [ISTM-CNR and INSTM, Department of Chemistry, Padova University, Via Marzolo, 1-35131 Padova (Italy); Gasparotto, Alberto; Maccato, Chiara; Tondello, Eugenio [Department of Chemistry, Padova University and INSTM, Via Marzolo, 1-35131 Padova (Italy)], E-mail: alberto.gasparotto@unipd.it

    2008-06-25

    This work is focused on the development of an innovative synthetic route to SiO{sub 2}-sandwiched Au nanoparticle arrays. The adopted strategy consists of: (i) the radio frequency sputtering of gold on thermally oxidized Si(100) and silica substrates from Ar plasmas; (ii) the plasma enhanced chemical vapor deposition of a SiO{sub 2} overlayer using tetramethoxysilane as precursor from Ar-O{sub 2} plasmas. A common feature of both preparative stages is the use of very soft processing conditions at temperatures close to room temperature, in order to tailor the Au nanoparticle morphology and to preserve it upon SiO{sub 2} coverage. In situ monitoring of gold deposition was accomplished by means of laser reflection interferometry. Valuable information on the system morphology before and after SiO{sub 2} coverage was provided by field emission-scanning electron microscopy for samples with different Au content. Additional important information on the system chemical composition, structure and optical response was gained by the combined use of x-ray photoelectron spectroscopy, glancing incidence x-ray diffraction and UV-visible absorption spectroscopy. The results obtained highlight the formation of high-purity SiO{sub 2}/Au/SiO{sub 2}-sandwiched stacks, in which the gold content and distribution, as well as the nanoparticle morphology, could be tailored by the sole variation of the sputtering time, without any further ex situ treatment.

  20. Materials Analysis of Transient Plasma-Wall Interactions

    Science.gov (United States)

    2014-05-13

    model showing the importance sputter and re-deposition. plasma, pulsed plasma, directed energy, transient wall interaction, high energy density...each equipped with a 25kV copper- vapor thyratron start switch capable of sub-microsecond triggering resolution. Each start switch is paired with a...sample exposure positions within the plasma jet. The probe utilizes a PCB Piezotronics model 113B21 pressure sensor modified to work in the plasma jet

  1. Microwave properties of RF- sputtered ZnFe{sub 2}O{sub 4} thin films

    Energy Technology Data Exchange (ETDEWEB)

    Garg, T., E-mail: gargphy@iitb.ac.in; Kulkarni, A. R.; Venkataramani, N. [Department of Metallurgical Engineering and Materials Science, IIT Bombay, Mumbai-400076 (India); Sahu, B. N.; Prasad, Shiva [Department of Physics, IIT Bombay, Mumbai-400076 (India)

    2014-04-24

    In this work, RF- magnetron sputtering technique has been employed to deposit nanocrystalline ZnFe{sub 2}O{sub 4} thin films at room temperature. The as grown films were ex-situ annealed in air for 2 h at temperatures from 150°C to 650°C. X-ray diffraction, vibrating sample magnetometer and ferromagnetic resonance were used to analyze the phase formation, magnetic properties and microwave properties respectively. From the hysteresis loops and ferromagnetic resonance spectra taken at room temperature, a systematic study on the effect of O{sub 2} plasma on microwave properties with respect to processing temperature has been carried out.

  2. Ground state atomic oxygen in high-power impulse magnetron sputtering: a quantitative study

    Science.gov (United States)

    Britun, Nikolay; Belosludtsev, Alexandr; Silva, Tiago; Snyders, Rony

    2017-02-01

    The ground state density of oxygen atoms in reactive high-power impulse magnetron sputtering discharges has been studied quantitatively. Both time-resolved and space-resolved measurements were conducted. The measurements were performed using two-photon absorption laser-induced fluorescence (TALIF), and calibrated by optical emission actinometry with multiple Ar emission lines. The results clarify the dynamics of the O ground state atoms in the discharge afterglow significantly, including their propagation and fast decay after the plasma pulse, as well as the influence of gas pressure, O2 admixture, etc.

  3. Magnetron reactively sputtered Ti-DLC coatings on HNBR rubber: The influence of substrate bias

    OpenAIRE

    Bui, X. L.; Pei, Y.T.; De Hosson, J. Th. M.

    2008-01-01

    In this study, Ti-containing diamond-like carbon (Ti-DLC) coatings have been deposited on HNBR (hydrogenated nitrile butadiene) rubber and also on Si wafer as reference via unbalanced magnetroli reactive sputtering from a Ti target in C2H2/Ar plasma. The deposition rates of coatings on rubber and Si wafer were about the same. Columnar structures resulting from a rough interface were often observed in the coatings deposited on rubbers. Only at a high bias voltage of -300 V the coating on HNBR ...

  4. Determination of heavy metals and their speciation in street dusts by inductively coupled plasma-optical emission spectrometry after a Community Bureau of Reference sequential extraction procedure.

    Science.gov (United States)

    Altundag, Huseyin; Imamoglu, Mustafa; Doganci, Secil; Baysal, Erkan; Albayrak, Sinem; Tuzen, Mustafa

    2013-01-01

    Sequential selective extraction techniques are commonly used to fractionate the solid-phase forms of metals in soils. This procedure provides measurements of extractable metals from media, such as acetic acid (0.11 M), hydroxyl ammonium chloride (0.1 M), hydrogen peroxide (8.8 M) plus ammonium acetate (1 M), and aqua regia stages of the sequential extraction procedure. In this work, the extractable Pb, Cu, Mn, Sr, Ni, V, Fe, Zn, and Cr were evaluated in street dust samples from Sakarya, Turkey, between May and October 2009 using the three-step sequential extraction procedure described by the Community Bureau of Reference (BCR, now the Standards, Measurements, and Testing Programme) of the European Union. The sampling sites were divided into 10 categories; a total of 50 street dusts were analyzed. The determination of multielements in the samples was performed by inductively coupled plasma-optical emission spectrometry. Validation of the proposed method was performed using BCR 701 certified reference material. The results showed good agreement between the obtained and the certified values for the metals analyzed.

  5. Deposition of thin titanium-copper films with antimicrobial effect by advanced magnetron sputtering methods

    Energy Technology Data Exchange (ETDEWEB)

    Stranak, V., E-mail: stranak@physik.uni-greifswald.de [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany); Wulff, H. [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany); Rebl, H. [University of Rostock, Biomedical Res. Center, Dept. of Cell Biology, Schillingallee 69, 18057 Rostock (Germany); Zietz, C. [University of Rostock, Dept. of Orthopaedics, Doberaner Str. 142, 18057 Rostock (Germany); Arndt, K. [University of Rostock, Dept. of Med. Microbiol., Virology and Hygiene, Schillingallee 70, 18057 Rostock (Germany); Bogdanowicz, R. [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany); Nebe, B. [University of Rostock, Biomedical Res. Center, Dept. of Cell Biology, Schillingallee 69, 18057 Rostock (Germany); Bader, R. [University of Rostock, Dept. of Orthopaedics, Doberaner Str. 142, 18057 Rostock (Germany); Podbielski, A. [University of Rostock, Dept. of Med. Microbiol., Virology and Hygiene, Schillingallee 70, 18057 Rostock (Germany); Hubicka, Z. [Academy of Sciences of the Czech Republic, Institute of Physics, Na Slovance 2, 180 00 Prague (Czech Republic); Hippler, R. [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany)

    2011-10-10

    The antibacterial effect of thin titanium-copper (Ti-Cu) films combined with sufficient growth of human osteoblastic cells is reported in the paper. Thin Ti-Cu films were prepared by three different plasma-assisted magnetron sputtering methods: direct current magnetron sputtering (dc-MS), dual magnetron sputtering (dual-MS) as well as dual high power impulse magnetron sputtering (dual-HiPIMS). The antimicrobial effect is caused by copper released from the metallic Ti-Cu films, which was measured by atomic absorption spectroscopy (AAS). The copper release is influenced by the chemical and physical properties of the deposited films and was investigated by X-ray diffractometry and X-ray reflectometry (GIXD and XR) techniques. It was found that, within the first 24 h the amount of Cu released from dual-HiPIMS films (about 250 {mu}g) was much higher than from dc-MS and dual-MS films. In vitro planktonic growth tests on Ti-Cu surfaces for Staphylococcus epidermidis and S. aureus demonstrated the killing of both bacteria using the Ti-Cu films prepared using the dual-HiPIMS technique. The killing effects on biofilm bacteria were less obvious. After the total release of copper from the Ti-Cu film the vitality of exposed human osteoblast MG-63 cells increased significantly. An initial cytotoxic effect followed by the growth of osteoblastic cells was demonstrated. The cytotoxic effect combined with growth of osteoblastic cells could be used in joint replacement surgery to reduce the possibility of infection and to increase adoption of the implants. Highlights: {yields} Ti-Cu films with significant cytotoxic effect were prepared by dual-HiPIMS technique. {yields} The cytotoxic effect is caused by total release of copper species from thin films. {yields} The copper release is influenced by crystallography and chemical properties of thin films. {yields} Sufficient growth of osteoblastic cells follows after copper release.

  6. Coating metals on micropowders by magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Magnetron sputtering was used to coat various metals on micropowder surfaces. By using this method, the fine particles are better dispersed and can therefore be coated more homogeneously. The micro-powders used include cenospheres from fly ash of coal-burning electric power plants (diameter 40-200 μm and particle density 0.7±0.1 g/cm3), as well as carborundum particles of different sizes. Aluminum, silver, copper, cobalt and nickel were used as the coating metals. Tests showed that the coated metal film was compact adhering tightly on the base powders, and the coated powders possess adequate flow properties.

  7. Origin of the energetic ion beams at the substrate generated during high power pulsed magnetron sputtering of titanium

    CERN Document Server

    Maszl, Christian; Benedikt, Jan; von Keudell, Achim

    2013-01-01

    High power pulsed magnetron sputtering (HiPIMS) plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering. The origin of these energetic ions in HiPIMS is still an open issue, which is unraveled by using three fast diagnostics: time resolved mass spectrometry with a temporal resolution of 2 $\\mu$s, phase resolved optical emission spectroscopy with 1 $\\mu$s and the rotating shutter experiment with a resolution of 50 $\\mu$s. A power scan from dcMS-like to HiPIMS plasmas was performed, with a 2-inch magnetron and a titanium target as sputter source and argon as working gas. Clear differences in the transport as well in the energetic properties of Ar$^+$, Ar$^{2+}$, Ti$^+$ and Ti$^{2+}$ were observed. For discharges with highest peak power densities a high energetic group of Ti$^{+}$ and Ti$^{2+}$ could be identified. A cold group of ions is always present. It is found that hot ions are observed only, when the plasma enters the spokes regime, ...

  8. Synchronized metal-ion irradiation as a way to control growth of transition-metal nitride alloy films during hybrid HIPIMS/DCMS co-sputtering

    Science.gov (United States)

    Greczynski, Grzegorz

    2016-09-01

    High-power pulsed magnetron sputtering (HIPIMS) is particularly attractive for growth of transition metal (TM) nitride alloys for two reasons: (i) the high ionization degree of the sputtered metal flux, and (ii) the time separation of metal- and gas-ion fluxes incident at the substrate. The former implies that ion fluxes originating from elemental targets operated in HIPIMS are distinctly different from those that are obtained during dc magnetron sputtering (DCMS), which helps to separate the effects of HIPIMS and DCMS metal-ion fluxes on film properties. The latter feature allows one to minimize compressive stress due to gas-ion irradiation, by synchronizing the pulsed substrate bias with the metal-rich-plasma portion of the HIPIMS pulse. Here, we use pseudobinary TM nitride model systems TiAlN, TiSiN, TiTaN, and TiAlTaN to carry out experiments in a hybrid configuration with one target powered by HIPIMS, the other operated in DCMS mode. This allows us to probe the roles of intense and metal-ion fluxes (n = 1 , 2) from HIPIMS-powered targets on film growth kinetics, microstructure, and physical properties over a wide range of M1M2N alloy compositions. TiAlN and TiSiN mechanical properties are shown to be determined by the average metal-ion momentum transfer per deposited atom. Irradiation with lighter metal-ions (M1 =Al+ or Si+ during M1-HIPIMS/Ti-DCMS) yields fully-dense single-phase cubic Ti1-x (M1)x N films. In contrast, with higher-mass film constituent ions such as Ti+, easily exceeds the threshold for precipitation of second phase w-AlN or Si3N4. Based on the above results, a new PVD approach is proposed which relies on the hybrid concept to grow dense, hard, and stress-free thin films with no external heating. The primary targets, Ti and/or Al, operate in DCMS mode providing a continuous flux of sputter-ejected metal atoms to sustain a high deposition rate, while a high-mass target metal, Ta, is driven by HIPIMS to serve as a pulsed source of energetic

  9. Modeling the Europa plasma torus

    Science.gov (United States)

    Schreier, Ron; Eviatar, Aharon; Vasyliunas, Vytenis M.; Richardson, John D.

    1993-12-01

    The existence of a torus of plasma generated by sputtering from Jupiter's satellite Europa has long been suspected but never yet convincingly demonstrated. Temperature profiles from Voyager plasma observations indicate the presence of hot, possibly freshly picked-up ions in the general vicinity of the orbit of Europa, which may be interpreted as evidence for a local plasma torus. Studies of ion partitioning in the outer regions of the Io torus reveal that the oxygen to sulfur mixing ratio varies with radial distance; this may indicates that oxygen-rich matter is injected from a non-Io source, most probably Europa. We have constructed a quantitative model of a plasma torus near the orbit of Europa which takes into account plasma input from the Io torus, sputtering from the surface of Europa, a great number of ionization and charge exchange processes, and plasma loss by diffusive transport. When the transport time is chosen so that the model's total number density in consistent with the observed total plasma density, the contribution from Europa is found to be significant although not dominant. The model predicts in detail the ion composition, charge states, and the relative fractions of hot Europa-generated and (presumed) cold Io-generated ions. The results are generally consistent with observations from Voyager and can in principle (subject to limitations of data coverage) be confirmed in more detail by Ulysses.

  10. Synthesis of Alumina Thin Films Using Reactive Magnetron Sputtering Method

    Science.gov (United States)

    Angarita, G.; Palacio, C.; Trujillo, M.; Arroyave, M.

    2017-06-01

    Alumina (Al2O3) thin films were deposited on Si (100) by Magnetron Sputtering in reactive conditions between an aluminium target and oxygen 99.99% pure. The plasma was formed employing Argon with an R.F power of 100 W, the dwelling time was 3 hours. 4 samples were produced with temperatures between 350 and 400 ºC in the substrate by using an oxygen flow of 2 and 8 sccm, the remaining parameters of the process were fixed. The coatings and substrates were characterized using Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), X-ray diffraction (XRD) and Energy Dispersive Spectroscopy (EDS) in order to compare their properties before and after deposition. The films thicknesses were between 47 and 70 nm. The results show that at high oxygen flow the alumina structure prevails in the coatings while at lower oxygen flow only aluminum is deposited in the coatings. It was shown that the temperature increases grain size and roughness while decreasing the thicknesses of the coatings.

  11. Sputtering of the most volatile solids: The solid hydrogens

    DEFF Research Database (Denmark)

    Schou, Jørgen; Stenum, B.; Ellegaard, O.

    1995-01-01

    Electronic sputtering of the three stable hydrogenic solids, H-2, HD and D-2 by keV hydrogen and deuterium ions has been studied at the low-temperature setup at Riso. The yield of the sputtered particles has been determined for hydrogenic films of thicknesses ranging from 0.1 X 10(18) up to 10 X ...

  12. Sputtering of Ge(001): transition between dynamic scaling regimes

    DEFF Research Database (Denmark)

    Smilgies, D.-M.; Eng, P.J.; Landemark, E.;

    1997-01-01

    We have studied the dynamic behavior of the Ge(001) surface during sputtering in situ and in real time using synchrotron X-ray diffraction. We find two dynamic regimes as a function of surface temperature and sputter current which are separated by a sharp transition. The boundary between these two...

  13. Sputtering of Thick Deuterium Films by KeV Electrons

    DEFF Research Database (Denmark)

    Thestrup Nielsen, Birgitte; Svendsen, Winnie Edith; Schou, Jørgen;

    1994-01-01

    Sputtering of thick films of solid deuterium up to several μm by keV electrons is reported for the first time. The sputtering yield increases within a narrow range of thicknesses around 1.6 μm by about 2 orders of magnitude for 1.5 keV electrons. A similar behavior has not been observed for ion...

  14. Sputtering of solid nitrogen by keV helium ions

    DEFF Research Database (Denmark)

    Ellegaard, O.; Schou, Jørgen; Sørensen, H.;

    1993-01-01

    Solid nitrogen has become a standard material among the frozen molecular gases for electronic sputtering. We have combined measurements of sputtering yields and energy spectra from nitrogen bombarded by 4-10 keV helium ions. The data show that the erosion is electronic rather than knockon...

  15. Growth of brass nanofilms sputtered on organic substrate

    Institute of Scientific and Technical Information of China (English)

    CHEN Zhen-xing; WANG Ling-sen; HUANG Bai-yun

    2005-01-01

    The growth of brass nanofilms sputtered on acrylics substrate was studied through experimental investigation of the effect of sputtering voltage, target-to-substrate distance, chamber pressure and sputtering time on the content, growth rate and surface morphology of brass nanofilms. The results show that compared with original brass target, Cu content in brass nanofilms changes by no more than 6.23% (mass fraction). High sputtering voltage and short target-to-substrate distance help to improve brass nanofilm deposition rate. There exists an optimal chamber pressure where deposition rate of nanofilm reaches the maximum. The key factor affecting surface morphology is the kinetic energy of sputtering particles. Low sputtering voltage, large target-to-substrate distance and low chamber pressure are very important for the formation of the high-quality brass nanofilms. The brass films prepared under the conditions of sputtering voltage 1.6 kV, target-to-substrate distance 2.5 cm, chamber pressure 10 Pa and sputtering time 20 min, possess following characteristics: smooth and uniform surface, thickness of 41 nm and Cu content of 71.0% (mass fraction).

  16. Monte Carlo simulations of nanoscale focused neon ion beam sputtering.

    Science.gov (United States)

    Timilsina, Rajendra; Rack, Philip D

    2013-12-13

    A Monte Carlo simulation is developed to model the physical sputtering of aluminum and tungsten emulating nanoscale focused helium and neon ion beam etching from the gas field ion microscope. Neon beams with different beam energies (0.5-30 keV) and a constant beam diameter (Gaussian with full-width-at-half-maximum of 1 nm) were simulated to elucidate the nanostructure evolution during the physical sputtering of nanoscale high aspect ratio features. The aspect ratio and sputter yield vary with the ion species and beam energy for a constant beam diameter and are related to the distribution of the nuclear energy loss. Neon ions have a larger sputter yield than the helium ions due to their larger mass and consequently larger nuclear energy loss relative to helium. Quantitative information such as the sputtering yields, the energy-dependent aspect ratios and resolution-limiting effects are discussed.

  17. Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions

    Science.gov (United States)

    Vašina, P; Hytková, T; Eliáš, M

    2009-05-01

    The majority of current models of the reactive magnetron sputtering assume a uniform shape of the discharge current density and the same temperature near the target and the substrate. However, in the real experimental set-up, the presence of the magnetic field causes high density plasma to form in front of the cathode in the shape of a toroid. Consequently, the discharge current density is laterally non-uniform. In addition to this, the heating of the background gas by sputtered particles, which is usually referred to as the gas rarefaction, plays an important role. This paper presents an extended model of the reactive magnetron sputtering that assumes the non-uniform discharge current density and which accommodates the gas rarefaction effect. It is devoted mainly to the study of the behaviour of the reactive sputtering rather that to the prediction of the coating properties. Outputs of this model are compared with those that assume uniform discharge current density and uniform temperature profile in the deposition chamber. Particular attention is paid to the modelling of the radial variation of the target composition near transitions from the metallic to the compound mode and vice versa. A study of the target utilization in the metallic and compound mode is performed for two different discharge current density profiles corresponding to typical two pole and multipole magnetics available on the market now. Different shapes of the discharge current density were tested. Finally, hysteresis curves are plotted for various temperature conditions in the reactor.

  18. Large area plasma source

    Science.gov (United States)

    Foster, John (Inventor); Patterson, Michael (Inventor)

    2008-01-01

    An all permanent magnet Electron Cyclotron Resonance, large diameter (e.g., 40 cm) plasma source suitable for ion/plasma processing or electric propulsion, is capable of producing uniform ion current densities at its exit plane at very low power (e.g., below 200 W), and is electrodeless to avoid sputtering or contamination issues. Microwave input power is efficiently coupled with an ionizing gas without using a dielectric microwave window and without developing a throat plasma by providing a ferromagnetic cylindrical chamber wall with a conical end narrowing to an axial entrance hole for microwaves supplied on-axis from an open-ended waveguide. Permanent magnet rings are attached inside the wall with alternating polarities against the wall. An entrance magnet ring surrounding the entrance hole has a ferromagnetic pole piece that extends into the chamber from the entrance hole to a continuing second face that extends radially across an inner pole of the entrance magnet ring.

  19. Sputtering effect of low-energy ions on biological target: The analysis of sputtering product of urea and capsaicin

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Lili [Key Laboratory of Ion Beam Bio-Engineering, Institute of Technical Biology and Agriculture Engineering of Chinese Academy of Sciences, Shushanhu Road 350, Hefei 230031 (China); Xu, Xue [Rice Research Institute, Anhui Academy of Agricultural Sciences, Nongke South Road 40, Hefei 230031 (China); Wu, Yuejin, E-mail: yjwu@ipp.ac.cn [Key Laboratory of Ion Beam Bio-Engineering, Institute of Technical Biology and Agriculture Engineering of Chinese Academy of Sciences, Shushanhu Road 350, Hefei 230031 (China)

    2013-08-01

    Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. Recent years, ion implantation was successfully applied to biological research based on the fragments sputtering and form open paths in cell structure caused by ion sputtering. In this study, we focused on urea and chilli pepper pericarp samples implanted with N{sup +} and Ar{sup +} ions. To investigate the sputtering effect, we designed a collecting unit containing a disk sample and a glass pipe. The urea content and capsaicin content recovered from glass pipes were adopted to represent the sputtering product. The result of urea showed that the sputtering effect is positively correlated with the ion energy and dose, also affected by the ion type. The result of capsaicin was different from that of urea at 20 keV and possibly due to biological complex composition and structure. Therefore the sputtering yield depended on both the parameters of incident ions and the state of target materials. The sputtering yield of urea was also simulated by computational method achieved through the TRIM program. The trajectories of primary and recoiled atoms were calculated on the basis of the binary collision approximation using Monte Carlo method. The experimental results were much higher than the calculated results. The possible explanation is that in the physical model the target were assumed as a disordered lattice and independent atoms, which is much less complicated than that of the biological models.

  20. Sputtering effect of low-energy ions on biological target: The analysis of sputtering product of urea and capsaicin

    Science.gov (United States)

    Zhang, Lili; Xu, Xue; Wu, Yuejin

    2013-08-01

    Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. Recent years, ion implantation was successfully applied to biological research based on the fragments sputtering and form open paths in cell structure caused by ion sputtering. In this study, we focused on urea and chilli pepper pericarp samples implanted with N+ and Ar+ ions. To investigate the sputtering effect, we designed a collecting unit containing a disk sample and a glass pipe. The urea content and capsaicin content recovered from glass pipes were adopted to represent the sputtering product. The result of urea showed that the sputtering effect is positively correlated with the ion energy and dose, also affected by the ion type. The result of capsaicin was different from that of urea at 20 keV and possibly due to biological complex composition and structure. Therefore the sputtering yield depended on both the parameters of incident ions and the state of target materials. The sputtering yield of urea was also simulated by computational method achieved through the TRIM program. The trajectories of primary and recoiled atoms were calculated on the basis of the binary collision approximation using Monte Carlo method. The experimental results were much higher than the calculated results. The possible explanation is that in the physical model the target were assumed as a disordered lattice and independent atoms, which is much less complicated than that of the biological models.

  1. Soft Gluon Radiation off Heavy Quarks beyond Eikonal Approximation

    Directory of Open Access Journals (Sweden)

    Trambak Bhattacharyya

    2016-01-01

    Full Text Available We calculate the soft gluon radiation spectrum off heavy quarks (HQs interacting with light quarks (LQs beyond small angle scattering (eikonality approximation and thus generalize the dead-cone formula of heavy quarks extensively used in the literatures of Quark-Gluon Plasma (QGP phenomenology to the large scattering angle regime which may be important in the energy loss of energetic heavy quarks in the deconfined Quark-Gluon Plasma medium. In the proper limits, we reproduce all the relevant existing formulae for the gluon radiation distribution off energetic quarks, heavy or light, used in the QGP phenomenology.

  2. Gauge/String Duality, Hot QCD and Heavy Ion Collisions

    Science.gov (United States)

    Casalderrey-Solana, Jorge; Liu, Hong; Mateos, David; Rajagopal, Krishna; Wiedemann, Urs Achim

    2014-06-01

    1. Opening remarks; 2. A heavy ion phenomenology primer; 3. Results from lattice QCD at nonzero temperature; 4. Introducing the gauge/string duality; 5. A duality toolbox; 6. Bulk properties of strongly coupled plasma; 7. From hydrodynamics for far-from-equilibrium dynamics; 8. Probing strongly coupled plasma; 9. Quarkonium mesons in strongly coupled plasma; 10. Concluding remarks and outlook; Appendixes; References; Index.

  3. Droplet-free high-density metal ion source for plasma immersion ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Nakamura, Keiji [Department of Electrical Engineering, College of Engineering, Chubu University, 1200 Matsumoto, Kasugai, Aichi 487-8501 (Japan)]. E-mail: nakamura@solan.chubu.ac.jp; Yoshinaga, Hiroaki [Department of Electrical Engineering, Doshisha University, 1-3 Tatara Miyakodani, Kyotanabe, Kyoto 610-0321 (Japan); Yukimura, Ken [Department of Electrical Engineering, Doshisha University, 1-3 Tatara Miyakodani, Kyotanabe, Kyoto 610-0321 (Japan)

    2006-01-15

    This paper reports on plasma parameters and ion composition of droplet-free Zr ion source for plasma immersion ion implantation and deposition (PIII and D). Zirconium (Zr) ions were obtained by ionizing sputtered Zr atoms in inductively-coupled argon discharge. The characteristics of plasma density, plasma potential and electron temperature were typical ones of such a inductive discharge, and the plasma parameters were not significantly influenced by mixing the sputtered Zr atoms into the plasma. Actually, the main ionic component was still Ar{sup +} ions, and the ion density ratio of [Zr{sup +}]/[Ar{sup +}] was as low as {approx}8%. Increase in sputtering rate of the Zr source will be necessary to improve the ion density ratio.

  4. Methods for natural gas and heavy hydrocarbon co-conversion

    Science.gov (United States)

    Kong, Peter C.; Nelson, Lee O.; Detering, Brent A.

    2009-02-24

    A reactor for reactive co-conversion of heavy hydrocarbons and hydrocarbon gases and includes a dielectric barrier discharge plasma cell having a pair of electrodes separated by a dielectric material and passageway therebetween. An inlet is provided for feeding heavy hydrocarbons and other reactive materials to the passageway of the discharge plasma cell, and an outlet is provided for discharging reaction products from the reactor. A packed bed catalyst may optionally be used in the reactor to increase efficiency of conversion. The reactor can be modified to allow use of a variety of light sources for providing ultraviolet light within the discharge plasma cell. Methods for upgrading heavy hydrocarbons are also disclosed.

  5. Comparison of tunable bandpass reaction cell inductively coupled plasma mass spectrometry with conventional inductively coupled plasma mass spectrometry for the determination of heavy metals in whole blood and urine

    Science.gov (United States)

    Nixon, David E.; Neubauer, Kenneth R.; Eckdahl, Steven J.; Butz, John A.; Burritt, Mary F.

    2004-09-01

    A Dynamic Reaction Cell™ inductively coupled plasma mass spectrometer (DRC-ICP-MS) was evaluated for the determination of arsenic, lead, cadmium, mercury, and thallium in urine and whole blood. Reaction cell conditions were evaluated for suppression of ArCl + and CaCl + polyatomic interferences. The reaction gas was 5% hydrogen in argon. Lead, cadmium, mercury, and thallium were determined with the reaction cell vented. Mixture of 2.5% t-butanol, 0.5% HCl, and 2 mg Au/l plus Ga, Rh, and Bi internal standards was used to dilute whole blood and urine. Calibration was achieved using aqueous acidic standards spiked into urine matrix. Urine and whole blood addition calibration curves were nearly identical for all five elements. DRC-ICP-MS detection limits were equivalent or better than conventional ICP-MS. Within run coefficients of variation (CV's) were nearly the same for DRC-ICP-MS and conventional ICP-MS for National Institute of Standards and Technology (NIST) SRM 2670 and BioRad Lyphochek Urine Metals Control. DRC-ICP-MS within run CV's for As, Pb, Cd, and Hg were 1.9%, 4%, 1.7%, and 1.7%, respectively, for NIST 2670 and 2.9%, 1.8%, 3.4%, 1.7%, and 1.0% for BioRad urine. BioRad Lyphochek Whole Blood control concentrations and CV's were: 78 μg/l (3.8%), 284 μg/l (0.52%), and 544 μg/l (0.9%). With the exception of mercury day-to-day CV's for certified whole blood and urine controls were less than 4% on both the DRC-ICP-MS and conventional ICP-MS.

  6. Heavy flavour in ALICE

    CERN Document Server

    Pillot, Philippe

    2008-01-01

    Open heavy flavours and heavy quarkonium states are expected to provide essential informa- tion on the properties of the strongly interacting system fo rmed in the early stages of heavy-ion collisions at very high energy density. Such probes are espe cially promising at LHC energies where heavy quarks (both c and b) are copiously produced. The ALICE detector shall measure the production of open heavy flavours and heavy quarkonium st ates in both proton-proton and heavy-ion collisions at the LHC. The expected performances of ALICE for heavy flavour physics is discussed based on the results of simulation studies on a s election of benchmark channels

  7. Transport Phenomena of Off-Axis Sputtering Deposition

    Science.gov (United States)

    Zhu, S.; Su, C. H.; Lehoczky, S. L.; Zhang, S.; Whitaker, Ann F. (Technical Monitor)

    2001-01-01

    Various high quality epitaxial films, especially oxides, have been synthesized using off-axis sputtering deposition. In this presentation, we report the experiment results of ZnO films grown by the off-axis sputtering deposition. Films were synthesized in temperatures ranged from room temperature to 600 C, and pressures from 5 mTorr to 150 mTorr. Film growth rate was measured by surface profilometer, ellipsometer, and wavelength dispersive spectrometry. Due to the collisions between the sputtered species and the residue gases, the kinetic energy of species was reduced and the transport of depositing species changed from a ballistic movement for low pressure to a diffuse drift for high pressure in which the transport species were almost thermalized. The measurements show an increase of growth rates along the gravity vector when the Knodson (Knudsen??) number of transport species is less than 0.05, which suggests that gravity affected the transport characterization in off-axis sputtering deposition. Because the product of pressure (p) and travel distance (d) of sputtered species, p exceeds several mTorr-cm during film deposition, the classical simulations for sputtering process in high vacuum system may not be applied. Based on these experimental measurements, a transport process of the off-axis sputtering deposition is proposed. Several methods including the Monte Carlo method and gravity-driven flow dynamics simulation will be discussed.

  8. ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques

    Energy Technology Data Exchange (ETDEWEB)

    Purandare, Yashodhan, E-mail: Y.Purandare@shu.ac.uk; Ehiasarian, Arutiun; Hovsepian, Papken [Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield S1 1WB (United Kingdom); Santana, Antonio [Ionbond AG Olten, Industriestrasse 211, CH-4600 Olten (Switzerland)

    2014-05-15

    Zirconium nitride (ZrN) coatings were deposited on 1 μm finish high speed steel and 316L stainless steel test coupons. Cathodic Arc (CA) and High Power Impulse Magnetron Sputtering (HIPIMS) + Unbalanced Magnetron Sputtering (UBM) techniques were utilized to deposit coatings. CA plasmas are known to be rich in metal and gas ions of the depositing species as well as macroparticles (droplets) emitted from the arc sports. Combining HIPIMS technique with UBM in the same deposition process facilitated increased ion bombardment on the depositing species during coating growth maintaining high deposition rate. Prior to coating deposition, substrates were pretreated with Zr{sup +} rich plasma, for both arc deposited and HIPIMS deposited coatings, which led to a very high scratch adhesion value (L{sub C2}) of 100 N. Characterization results revealed the overall thickness of the coatings in the range of 2.5 μm with hardness in the range of 30–40 GPa depending on the deposition technique. Cross-sectional transmission electron microscopy and tribological experiments such as dry sliding wear tests and corrosion studies have been utilized to study the effects of ion bombardment on the structure and properties of these coatings. In all the cases, HIPIMS assisted UBM deposited coating fared equal or better than the arc deposited coatings, the reasons being discussed in this paper. Thus H+U coatings provide a good alternative to arc deposited where smooth, dense coatings are required and macrodroplets cannot be tolerated.

  9. Post Magnetron Sputter And Reactive Sputter Coating Of Contoured Glass, Acrylic And Polycarbonate Substrates

    Science.gov (United States)

    Wright, Michael P.

    1985-12-01

    A Post Magnetron Sputter concept employing a cylindrical internally cooled target (cathode) is described. The use of an internal, rotating, permanent magnetic field resulting in 360° utilisation of the target material is outlined. Computer controlled horizontal and vertical movement of the cathode assembly facilitates the coating of contoured substrates which may be glass, acrylic or polycarbonate. Deposition of different metals is easily achieved by changing the cathode or covering it with a suitable sheath material. The design of the cathode results in economic utilisation of the target material, which is particularly important when sputtering expensive metals such as gold. In addition to the deposition of metallic films, such as stainless steel or chrome, reactive sputtering may be undertaken by the introduction of a reactive gas into the vacuum chamber. In this way metal oxide, sulphide or nitride layers may be deposited according to the requirements of the layer structure. Specific optically-active oxides such as indium tin oxide are easily deposited in a uniform film and the formation of multilayer coatings for sun protective and heat rejecting applications is practicable. Indeed, a complete process may be undertaken without removing the substrate from the chamber; merely by adding or changing the reactive gas present.

  10. Determination of released heavy metal elements in concrete by inductively coupled plasma mass spectrometry%混凝土中重金属元素溶出量的质谱分析

    Institute of Scientific and Technical Information of China (English)

    周学忠; 谢华林

    2012-01-01

    An inductively coupled plasma mass spectrometry (ICP-MS) with an octopole reaction/collision cell and shield torch system was employed for the simultaneous determination of released heavy metal elements in concrete. The elements Cr, Mn, Ni, Cu, Zn, As, Cd, Sn, Sb and Pb were determined by introducing the hydrogen gas or helium gas into the reaction/collision cell to eliminate the interference of multi-element molecules and ions. Ge, In and Tb were used to correct the matrix interference and drift. Under the optimal conditions, the detection limits of the 10 elements are in the range of 0. 001 ~ 0. 033 μg/L with the relative standard deviation (RSDs) 0. 85% ~2. 8% , and the recoveries of the samples were in the range of 91.1%~103.9%.%利用带八极杆碰撞/反应池和屏蔽炬技术的电感耦合等离子体质谱直接测定混凝土中Cr,Mn,Ni,Cu,Zn,As,Cd,Sn,Sb,Pb等多种重金属元素的溶出量.通过向碰撞池中引入氢气和氦气消除多元素分子离子的干扰,以50μg/L的Ge,In,Tb为内标元素校正基体干扰和漂移.10种待测元素的检出限为0.001~0.033μg/L,相对标准偏差为0.85%~2.8%,样品的加标回收率在91.1%~103.9%之间.

  11. Nonperturbative Heavy-Quark Interactions in the QGP

    Energy Technology Data Exchange (ETDEWEB)

    Rapp, Ralf; Riek, Felix [Texas A and M University, Cyclotron Institute and Physics Department, College Station, TX, 77843-3666 (United States); Hees, Hendrik van [Justus-Liebig-Universitaet Giessen, Heinrich-Buff-Ring 16, D-35392 Giessen (Germany); Greco, Vincenzo [INFN-LNS, Laboratori Nazionali del Sud, and Dipartimento di Fisica e Astronomia, Universita di Catania (Italy); Mannarelli, Massimo [IEEC/CSIC, Universitat Autonoma de Barcelona, Torre C5, E-08193 Bellaterra (Barcelona) (Spain)

    2009-11-01

    We adopt a T-matrix approach to study quarkonium properties and heavy-quark transport in a Quark-Gluon Plasma. The T-matrix approach is well suited to implement potential scattering and thus provides a common framework for low-momentum transfer interactions in heavy-heavy and heavy-light quark systems. We assume that the underlying potentials can be estimated from the heavy-quark free energy computed in lattice QCD. We discuss constraints from vacuum spectroscopy, uncertainties arising from different choices of the potential, and the role of elastic and inelastic widths which are naturally accounted for in the T-matrix formalism.

  12. Radio-frequency magnetron triode sputtering of cadmium telluride and zinc telluride films and solar cells

    Science.gov (United States)

    Sanford, Adam Lee

    The n-CdS/p-CdTe solar cell has been researched for many years now. Research groups use a variety of processes to fabricate thin-film CdS/CdTe cells, including physical vapor deposition, chemical vapor deposition, and RF diode sputtering. One of the central areas of investigation concerning CdS/CdTe cells is the problem of a Schottky barrier at the back contact. Even cells fabricated with ohmic back contacts degrade into Schottky barriers as the devices are used. This severely degrades power generation. One possible solution is to use p+-ZnTe as an interlayer between CdTe and the back contact. ZnTe is easily doped with Cu to be p-type. However, even contacts with this ZnTe interlayer degrade over time, because Cu is highly mobile and diffuses away from the contact towards the CdS/CdTe junction. Another possibility is to dope ZnTe with N. It has been demonstrated using molecular beam epitaxy and RF diode sputtering. In this study, CdTe films are fabricated using a variation of RF diode sputtering called triode sputtering. This technique allows for control of ion bombardment to the substrate during deposition. Also, a higher plasma density near the target is achieved allowing depositions at lower pressures. These films are characterized structurally to show the effects of the various deposition parameters. N-doped ZnTe films are also fabricated using this technique. These films are characterized electrically to show the effects of the various deposition parameters. Also, the effects of post-deposition annealing are observed. It is found that annealing at the right temperature can increase the conductivity of the films by a factor of 3 or more. However, annealing at higher temperatures decreases the conductivity to as low as 12% of the initial conductivity. Finally, RF triode sputtered N-doped ZnTe films are used as an interlayer at the back contact of a CdS/CdTe solar cell. The effects of annealing the device before and after contact deposition are observed

  13. Intrinsic stress analysis of sputtered carbon film

    Institute of Scientific and Technical Information of China (English)

    Liqin Liu; Zhanshan Wang; Jingtao Zhu; Zhong Zhang; Moyan Tan; Qiushi Huang; Rui Chen; Jing Xu; Lingyan Chen

    2008-01-01

    Intrinsic stresses of carbon films deposited by direct current (DC) magnetron sputtering were investigated.The bombardments of energetic particles during the growth of films were considered to be the main reason for compressive intrinsic stresses.The values of intrinsic stresses were determined by measuring the radius of curvature of substrates before and after film deposition.By varying argon pressure and target-substrate distance,energies of neutral carbon atoms impinging on the growing films were optimized to control the intrinsic stresses level.The stress evolution in carbon films as a function of film thickness was investigated and a void-related stress relief mechanism was proposed to interpret this evolution.

  14. Cu Films Deposited by Unbalanced Magnetron Sputtering Enhanced by ICP and External Magnetic Field Confinement

    Institute of Scientific and Technical Information of China (English)

    QI Xuelian; REN Chunsheng; MA Tengcai; WANG Younian

    2008-01-01

    Metallic copper(Cu) films were deposited on a Si (100) substrate by unbalanced magnetron sputtering enhanced by radio-frequency plasma and external magnetic field confine-ment. The morphology and structure of the films were examined by scanning electron microscopy (SEM), atomic force microscope (AFM) and X-ray diffraction (XRD). The surface average rough-ness of the deposited Cu films was characterized by AFM data and resistivity was measured by a four-point probe. The results show that the Cu films deposited with radio-frequency discharge enhanced ionization and external magnetic field confinement have a smooth surface, low surface roughness and low resistivity. The reasons may be that the radio-frequency discharge and external magnetic field enhance the plasma density, which further improves the ion bombardment effect under the same bias voltage conditions. Ion bombardment can obviously influence the growth features and characteristics of the deposited Cu films.

  15. Energy flux to substrate in high-power impulse magnetron sputtering measured by using optical low-coherence interferometry

    Science.gov (United States)

    Hattori, Katsuhiro; Ohta, Takayuki; Oda, Akinori; Kousaka, Hiroyuki; Ito, Masafumi

    2016-09-01

    The substrate during the plasma irradiation is heated by charged species, neutral species, and the heat radiation and the substrate temperature is determined by energy flux to the substrate. High-power impulse magnetron sputtering (HiPIMS) using short-pulse high-voltage promotes the ionization of sputtered atoms and realizes high density plasma. In this study, we measured the silicon substrate temperature with non-contact type substrate temperature measurement method using optical low-coherence interferometry(LCI) and elucidated the heating mechanisms of the substrate temperature in HiPIMS. The target material was Ti and the distance between the substrate and the target was 60mm. Ar is used as the sputtering gas. The pulse width was from 50 to 300 µsec, the pulse frequency was from 100 to 500Hz. Applied voltages were changed to be from -400V to -900V. Measurement accuracy of contact-type thermocouples and that of noncontact-type LCI were within 2 degree C and 0.7 degree C, respectively. The heat influx to the substrate was calculated from the temporal variation of substrate temperature base on the energy balance equation and increased with increasing applied voltage. The emission intensity of Ti ion increased with increasing applied voltage even though that of Ti atom was constant. These results suggested that main contribution of substrate heating is Ti ion bombardment.

  16. Method to control deposition rate instabilities—High power impulse magnetron sputtering deposition of TiO{sub 2}

    Energy Technology Data Exchange (ETDEWEB)

    Kossoy, Anna, E-mail: annaeden@hi.is, E-mail: anna.kossoy@gmail.com; Magnusson, Rögnvaldur L.; Tryggvason, Tryggvi K.; Leosson, Kristjan; Olafsson, Sveinn [Physics Division, Science Institute—University of Iceland, Reykjavik 107 (Iceland)

    2015-03-15

    The authors describe how changes in shutter state (open/closed) affect sputter plasma conditions and stability of the deposition rate of Ti and TiO{sub 2} films. The films were grown by high power impulse magnetron sputtering in pure Ar and in Ar/O{sub 2} mixture from a metallic Ti target. The shutter state was found to have an effect on the pulse waveform for both pure Ar and reactive sputtering of Ti also affecting stability of TiO{sub 2} deposition rate. When the shutter opened, the shape of pulse current changed from rectangular to peak-plateau and pulse energy decreased. The authors attribute it to the change in plasma impedance and gas rarefaction originating in geometry change in front of the magnetron. TiO{sub 2} deposition rate was initially found to be high, 1.45 Å/s, and then dropped by ∼40% during the first 5 min, while for Ti the change was less obvious. Instability of deposition rate poses significant challenge for growing multilayer heterostructures. In this work, the authors suggest a way to overcome this by monitoring the integrated average energy involved in the deposition process. It is possible to calibrate and control the film thickness by monitoring the integrated pulse energy and end growth when desired integrated pulse energy level has been reached.

  17. Lattice dynamics during electronic sputtering of solid Ne

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1997-01-01

    Electronic sputtering of solid neon has been studied with molecular dynamics. The cavity formation around an excited atom and particle migration in the surface region, as well as the sputtering process have been studied. A single atomic exciton has been observed to produce a desorption of up...... to five excited or ground state atoms. The ejection from the surface is induced by excitons formed in five outermost monolayers of the solid. Energy and angular distributions of sputtered excited and ground state atoms have been calculated and are compared with experimental data....

  18. Porous, High Capacity Coatings for Solid Phase Microextraction by Sputtering.

    Science.gov (United States)

    Diwan, Anubhav; Singh, Bhupinder; Roychowdhury, Tuhin; Yan, DanDan; Tedone, Laura; Nesterenko, Pavel N; Paull, Brett; Sevy, Eric T; Shellie, Robert A; Kaykhaii, Massoud; Linford, Matthew R

    2016-02-01

    We describe a new process for preparing porous solid phase microextraction (SPME) coatings by the sputtering of silicon onto silica fibers. The microstructure of these coatings is a function of the substrate geometry and mean free path of the silicon atoms, and the coating thickness is controlled by the sputtering time. Sputtered silicon structures on silica fibers were treated with piranha solution (a mixture of concd H2SO4 and 30% H2O2) to increase the concentration of silanol groups on their surfaces, and the nanostructures were silanized with octadecyldimethylmethoxysilane in the gas phase. The attachment of this hydrophobic ligand was confirmed by X-ray photoelectron spectroscopy and contact angle goniometry on model, planar silicon substrates. Sputtered silicon coatings adhered strongly to their surfaces, as they were able to pass the Scotch tape adhesion test. The extraction time and temperature for headspace extraction of mixtures of alkanes and alcohols on the sputtered fibers were optimized (5 min and 40 °C), and the extraction performances of SPME fibers with 1.0 or 2.0 μm of sputtered silicon were compared to those from a commercial 7 μm poly(dimethylsiloxane) (PDMS) fiber. For mixtures of alcohols, aldehydes, amines, and esters, the 2.0 μm sputtered silicon fiber yielded signals that were 3-9, 3-5, 2.5-4.5, and 1.5-2 times higher, respectively, than those of the commercial fiber. For the heavier alkanes (undecane-hexadecane), the 2.0 μm sputtered fiber yielded signals that were approximately 1.0-1.5 times higher than the commercial fiber. The sputtered fibers extracted low molecular weight analytes that were not detectable with the commercial fiber. The selectivity of the sputtered fibers appears to favor analytes that have both a hydrophobic component and hydrogen-bonding capabilities. No detectable carryover between runs was noted for the sputtered fibers. The repeatability (RSD%) for a fiber (n = 3) was less than 10% for all analytes tested

  19. New oxygen radical source using selective sputtering of oxygen atoms for high rate deposition of TiO{sub 2} films

    Energy Technology Data Exchange (ETDEWEB)

    Yasuda, Yoji; Lei, Hao; Hoshi, Yoichi [Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa 243-0297 (Japan); State Key Laboratory for Corrosion and Protection, Surface Engineering of Materials Division, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016 (China); Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa 243-0297 (Japan)

    2012-11-15

    We have developed a new oxygen radical source based on the reactive sputtering phenomena of a titanium target for high rate deposition of TiO{sub 2} films. In this oxygen radical source, oxygen radicals are mainly produced by two mechanisms: selective sputter-emission of oxygen atoms from the target surface covered with a titanium oxide layer, and production of high-density oxygen plasma in the space near the magnetron-sputtering cathode. Compared with molecular oxygen ions, the amount of atomic oxygen radicals increased significantly with an increase in discharge current so that atomic oxygen radicals were mainly produced by this radical source. It should be noted that oxygen atoms were selectively sputtered from the target surface, and titanium atoms sputter-emitted from the target cathode were negligibly small. The amount of oxygen radicals supplied from this radical source increased linearly with increasing discharge current, and oxygen radicals of 1 Multiplication-Sign 10{sup 15} atoms/s/cm{sup 2} were supplied to the substrate surface at a discharge current of 1.2 A. We conclude that our newly developed oxygen radical source can be a good tool to achieve high rate deposition and to control the structure of TiO{sub 2} films for many industrial design applications.

  20. Sputtering and surface topography modification of bismuth thin films under swift {sup 84}Kr{sup 15+} ion irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Mammeri, S. [Centre de Recherche Nucleaire d' Alger, CRNA, B.P. 399, 02 Bd. Frantz Fanon, Alger-Gare, Algiers (Algeria); Ouichaoui, S., E-mail: souchaoui@gmail.com [Universite des Sciences et de la Technologie H. Boumediene (USTHB), Faculte de Physique, Laboratoire SNIRM, B.P. 32, El-Alia, 16111 Bab Ezzouar, Algiers (Algeria); Ammi, H. [Centre de Recherche Nucleaire d' Alger, CRNA, B.P. 399, 02 Bd. Frantz Fanon, Alger-Gare, Algiers (Algeria); Pineda-Vargas, C.A. [iThemba LABS, National Research Foundation, P.O. Box 722, Somerset West 7129 (South Africa); Faculty of Health and Wellness Sciences, CPUT, P.O. Box 1906, Bellville 7535 (South Africa); Dib, A. [Centre de Recherche Nucleaire d' Alger, CRNA, B.P. 399, 02 Bd. Frantz Fanon, Alger-Gare, Algiers (Algeria); Msimanga, M. [iThemba LABS, National Research Foundation, P.O. Box 722, Somerset West 7129 (South Africa)

    2012-12-01

    The sputtering and surface topography modification of bismuth thin films deposited onto Si substrates and irradiated by 27.5 MeV {sup 84}Kr{sup 15+} ions over the fluence range 10{sup 12}-10{sup 14} cm{sup -2} have been studied using three complementary techniques: Rutherford backscattering spectrometry (RBS), atomic force microscopy (AFM) and X-ray diffraction (XRD). The RBS analysis reveals a linear reduction of the initial thickness of the irradiated bismuth samples by {approx}4% up to 7% with increasing ion fluence corresponding to a mean sputtering yield of {approx}2.9 Multiplication-Sign 10{sup 2} at/ion. Besides, significant sample surface topography changes occur upon ion irradiation consisting in grain growth and surface roughening clearly pointed out by performed AFM and XRD analyses. Moreover, a close correlation is observed between the variations versus ion fluence of the measured sputtering yield and the determined Bi surface grain size and compressive strain. These moderate Bi surface effects are similar to those pointed out previously for thin films irradiated by MeV heavy ions. They can be mainly caused by inelastic electronic collision mechanisms taking place within the Bi material electronic stopping power regime below the threshold for latent track formation.

  1. Tribological and structural properties of titanium nitride and titanium aluminum nitride coatings deposited with modulated pulsed power magnetron sputtering

    Science.gov (United States)

    Ward, Logan

    The demand for economical high-performance materials has brought attention to the development of advanced coatings. Recent advances in high power magnetron sputtering (HPPMS) have shown to improve tribological properties of coatings. These coatings offer increased wear and oxidation resistance, which may facilitate the use of more economical materials in harsh applications. This study demonstrates the use of novel forms of HPPMS, namely modulated pulsed-power magnetron sputtering (MPPMS) and deep oscillation magnetron sputtering (DOMS), for depositing TiN and Ti1-xAlxN tribological coatings on commonly used alloys, such as Ti-6Al-4V and Inconel 718. Both technologies have been shown to offer unique plasma characteristics in the physical vapor deposition (PVD) process. High power pulses lead to a high degree of ionization compared to traditional direct-current magnetron sputtering (DCMS) and pulsed magnetron sputtering (PMS). Such a high degree of ionization was previously only achievable by cathodic arc deposition (CAD); however, CAD can lead to increased macroparticles that are unfavorable in high friction and corrosive environments. MPPMS, DOMS, and other HPPMS techniques offer unique plasma characteristics and have been shown to produce coatings with refined grain structure, improved density, hardness, adhesion, and wear resistance. Using DOMS and MPPMS, TiN and Ti1-xAlxN coatings were deposited using PMS to compare microstructures and tribological performance. For Ti1-xAlxN, two sputtering target compositions, Ti 0.5Al0.5 and Ti0.3Al0.7, were used to evaluate the effects of MPPMS on the coating's composition and tribological properties. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), and X-ray diffraction (XRD) were used to characterize microstructure and crystallographic texture. Several tribological properties were evaluated including: wear rate, coefficient of friction, adhesion, and nanohardness. Results show that substrate

  2. Heavy metal jako subkultura

    OpenAIRE

    KOUTNÁ, Daniela

    2016-01-01

    This bachelor thesis deals with heavy metal subculture. Its aim is to introduce the most important branches and to show broadness of heavy metal. This bachelor thesis describes development and history, briefly shows Czech heavy metal history alongside with the biggest and most popular Czech heavy metal festivals. It shows the most dressing concerns of society against this style.

  3. Development of hydrophobicity of mica surfaces by ion beam sputtering

    Science.gov (United States)

    Metya, Amaresh; Ghose, Debabrata; Ray, Nihar Ranjan

    2014-02-01

    The hydrophilic mica surface can be made hydrophobic by low energy Ar+ ion sputtering. The ion sputtering leads to both topographical and physicochemical changes of the surface which are thought to be responsible for the water repelling behavior. The sessile drop method is used to evaluate the wetting properties of the sputtered mica surfaces. It has been shown that the sputter-pattern at the nano-length scale has little influence on the development of hydrophobicity. On the other hand, the wettability appears to be strongly connected with the chemistry of the bombarded surface. We have also studied the temporal evolution of contact angle as the water evaporates due to difference in vapor pressures between the droplet surface and the surroundings. The analysis offers a simple method to estimate the diffusion coefficient of water vapor.

  4. Development of hydrophobicity of mica surfaces by ion beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Metya, Amaresh; Ghose, Debabrata, E-mail: debabrata.ghose@saha.ac.in; Ray, Nihar Ranjan

    2014-02-28

    The hydrophilic mica surface can be made hydrophobic by low energy Ar{sup +} ion sputtering. The ion sputtering leads to both topographical and physicochemical changes of the surface which are thought to be responsible for the water repelling behavior. The sessile drop method is used to evaluate the wetting properties of the sputtered mica surfaces. It has been shown that the sputter-pattern at the nano-length scale has little influence on the development of hydrophobicity. On the other hand, the wettability appears to be strongly connected with the chemistry of the bombarded surface. We have also studied the temporal evolution of contact angle as the water evaporates due to difference in vapor pressures between the droplet surface and the surroundings. The analysis offers a simple method to estimate the diffusion coefficient of water vapor.

  5. Sputtering System for QWR Cavity in BRIF Project

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    <正>1 Introduction Four superconducting QWR cavities will be used in HI-13 tandem accelerator upgrade project (BRIF). These niobium coated cavities will be produced by CIAE. Up to now, a niobium sputtering

  6. Investigation of kinetics model of dc reactive sputtering

    Institute of Scientific and Technical Information of China (English)

    朱圣龙; 王福会; 吴维叓

    1996-01-01

    A novel physical sputtering kinetics model for reactive sputtering is presented.Reactive gas gettering effects and interactions among the characteristic parameters have been taken into account in the model.The data derived from the model accorded fairly well with experimental results.The relationship between the values of initial oxide coverage on the target and the ready states was depicted in the model.This relationship gives reasons for the difference of the threshold of reactive gas fluxes (Q) from the metal sputtering region to the oxide sputtering region and in reverse direction.The discontinuities in oxide coverage on the target surface (θ) versus reactive gas fluxes (Q) are referred to as the effects of reactive gas partial pressure (p) upon the forming rates of oxide on the surfaces of target (V0).The diversity of the oxygen flux threshold results from the variance of the initial values of oxide coverage on target.

  7. Sputter-Resistant Materials for Electric Propulsion Project

    Data.gov (United States)

    National Aeronautics and Space Administration — This SBIR Phase 2 project shall develop sputter-resistant materials for use in electric propulsion test facilities and for plume shields on spacecraft using electric...

  8. Preliminary results on adhesion improvement using Ion Beam Sputtering Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Yonggi; Kim, Bomsok; Lee, Jaesang [Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of)

    2013-05-15

    Sputtering is an established technique for depositing films with smooth surfaces and interfaces and good thick control. Ejection of articles from a condensed matter due to impingement of high energy particles, termed as sputtering was observed as early as in 1852, however, it is only recently that the complex process of sputtering system. Coating adhesion and environmental stability of the ion beam sputtering deposition coatings performed very well. High-energy high-current ion beam thin film synthesis of adhesion problems can be solved by using. Enhancement of adhesion in thin film synthesis, using high energy and high current ion beam, of mobile phones, car parts and other possible applications in the related industry Alternative technology of wet chrome plating, considering environment and unit cost, for car parts and esthetic improvement on surface of domestic appliances.

  9. Transition from linear to nonlinear sputtering of solid xenon

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen;

    1995-01-01

    Self-sputtering of solid xenon has been studied with molecular dynamics simulations as a model system for the transition from dominantly linear to strongly nonlinear effects. The simulation covered the projectile energy range from 20 to 750 eV. Within a relatively narrow range from 30 to 250 eV, ......V, nonlinear features such as high collision densities in the sputtering volume, amorphization of the crystalline structure, and an enhanced emission of low-energy atoms occur gradually....

  10. Sputtered iridium oxide films (SIROFs) for neural stimulation electrodes

    OpenAIRE

    Cogan, Stuart F.; Ehrlich, Julia; Plante, Timothy D.; Smirnov, Anton; Shire, Douglas B.; Gingerich, Marcus; Rizzo, Joseph F

    2004-01-01

    Sputtered iridium oxide films (SIROFs) deposited by DC reactive sputtering from an iridium metal target have been characterized in vitro for their potential as neural recording and stimulation electrodes. SIROFs were deposited over gold metallization on flexible multielectrode arrays fabricated on thin (15 µm) polyimide substrates. SIROF thickness and electrode areas of 200–1300 nm and 1960–125600 µm2, respectively, were investigated. The charge-injection capacities of the SIROFs were evaluat...

  11. Multiplicity and theremalization time in heavy-ions collisions

    Science.gov (United States)

    Aref'eva, Irina

    2016-10-01

    We present a concise review of quark-gluon plasma formation in heavy-ions collisions within the holographic approach. In particular, we discuss how to get the total multiplicity in heavy ions collision to fit the recent experimental data. We also discuss theoretical estimations of time formation of QGP in heavy ions collision and show that different observables can give the different times of QGP formation.

  12. Multiplicity and theremalization time in heavy-ions collisions

    Directory of Open Access Journals (Sweden)

    Aref’eva Irina

    2016-01-01

    Full Text Available We present a concise review of quark-gluon plasma formation in heavy-ions collisions within the holographic approach. In particular, we discuss how to get the total multiplicity in heavy ions collision to fit the recent experimental data. We also discuss theoretical estimations of time formation of QGP in heavy ions collision and show that different observables can give the different times of QGP formation.

  13. Theoretical Concepts for Ultra-Relativistic Heavy Ion Collisions

    CERN Document Server

    McLerran, Larry

    2009-01-01

    Various forms of matter may be produced in ultra-relativistic heavy ion collisions. These are the Quark Gluon Plasma, the Color Glass Condensate, the Glasma and Quarkyonic Matter. A novel effect that may be associated with topological charge fluctuations is the Chiral Magnetic Effect. I explain these concepts and explain how they may be seen in ultra-relativistic heavy ion collisions.

  14. Quarkonia at finite temperature in relativistic heavy-ion collisions

    Indian Academy of Sciences (India)

    Saumen Datta

    2015-05-01

    The behaviour of quarkonia in relativistic heavy-ion collisions is reviewed. After a detailed discussion of the current theoretical understanding of quarkonia in a static equilibriated plasma, we discuss quarkonia yield from the fireball created in ultrarelativistic heavy-ion collision experiments. We end with a brief discussion of the experimental results and outlook.

  15. Evaluation of residual stress in sputtered tantalum thin-film

    Energy Technology Data Exchange (ETDEWEB)

    Al-masha’al, Asa’ad, E-mail: asaad.al@ed.ac.uk; Bunting, Andrew; Cheung, Rebecca

    2016-05-15

    Highlights: • Tantalum thin-films have been deposited by DC magnetron sputtering system. • Thin-film stress is observed to be strongly influenced by sputtering pressure. • Transition towards the compressive stress is ascribed to the annealing at 300 °C. • Expose thin-film to air ambient or ion bombardment lead to a noticeable change in the residual stress. - Abstract: The influence of deposition conditions on the residual stress of sputtered tantalum thin-film has been evaluated in the present study. Films have been deposited by DC magnetron sputtering and curvature measurement method has been employed to calculate the residual stress of the films. Transitions of tantalum film stress from compressive to tensile state have been observed as the sputtering pressure increases. Also, the effect of annealing process at temperature range of 90–300 °C in oxygen ambient on the residual stress of the films has been studied. The results demonstrate that the residual stress of the films that have been deposited at lower sputtering pressure has become more compressive when annealed at 300 °C. Furthermore, the impact of exposure to atmospheric ambient on the tantalum film stress has been investigated by monitoring the variation of the residual stress of both annealed and unannealed films over time. The as-deposited films have been exposed to pure Argon energy bombardment and as result, a high compressive stress has been developed in the films.

  16. Optical Properties of Magnetron sputtered Nickel Thin Films

    Science.gov (United States)

    Twagirayezu, Fidele; Geerts, Wilhelmus J.; Cui, Yubo

    2015-03-01

    The study of optical properties of Nickel (Ni) is important, given the pivotal role it plays in the semiconductor and nano-electronics technology. Ni films were made by DC and RF magnetron sputtering in an ATC Orion sputtering system of AJA on various substrates. The optical properties were studied ex situ by variable angle spectroscopic (220-1000 nm) ellipsometry at room temperature. The data were modeled and analyzed using the Woollam CompleteEase Software fitting ellipsometric and transmission data. Films sputtered at low pressure have optical properties similar to that of Palik. Films sputtered at higher pressure however have a lower refraction index and extinction coefficient. It is expected from our results that the density of the sputtered films can be determined from the ellipsometric quantities. Our experiments also revealed that Ni is susceptible to a slow oxidation changing its optical properties over the course of several weeks. The optical properties of the native oxide differ from those of reactive sputtered NiO similar as found by. Furthermore the oxidation process of our samples is characterized by at least two different time constants.

  17. Photoelectrochemical detection of toxic heavy metals

    CSIR Research Space (South Africa)

    Chamier, J

    2010-09-01

    Full Text Available Toxic heavy metals in air, soil, and water are global problems that are a growing threat to the environment. Trace metal determination is currently done by expensive separation techniques which include inductively coupled plasma (ICP) and cold vapor...

  18. The quarkonium saga in heavy ion collisions

    CERN Document Server

    Tserruya, Itzhak

    2013-01-01

    J/psi suppression was proposed more than 25 years ago as an unambiguous signature for the formation of the Quark Gluon Plasma in relativistic heavy ion collisions. After intensive efforts, both experimental and theoretical, the quarkonium saga remains exciting, producing surprising results and not fully understood. This talk focuses on recent results on quarkonium production at RHIC and the LHC.

  19. Heavy-Ion Physics in a Nutshell

    Directory of Open Access Journals (Sweden)

    Hirano Tetsufumi

    2013-05-01

    Full Text Available The physics of quark gluon plasma (QGP and heavy ion collisions at the collider energies is briefly reviewed. We first discuss about the discovery of a nearly perfect fluidity of the QGP. We also highlights recent topics on responses of the QGP to initial deformation and propagation of a jet.

  20. Quarkonium production in heavy-ion collisions

    Directory of Open Access Journals (Sweden)

    Arnaldi Roberta

    2014-03-01

    Full Text Available The production of quarkonium states plays a crucial role among the probes to investigate the formation of the plasma of quarks and gluons (QGP in heavy-ion collisions. A review of the charmonium and bottomonium production, mainly focussing on the latest results from the LHC experiments, is presented.

  1. Heavy-flavour meson production at RHIC

    NARCIS (Netherlands)

    Mischke, A.

    2010-01-01

    Collisions of heavy atomic nuclei at very high beam energies allow to create and study hot QCD matter under laboratory-controlled conditions. Measurements at the SPS and RHIC facilities have yielded compelling evidence for the formation of this novel state of matter, the so-called Quark-Gluon Plasma

  2. RELATIVISTIC HEAVY ION PHYSICS: A THEORETICAL OVERVIEW.

    Energy Technology Data Exchange (ETDEWEB)

    KHARZEEV,D.

    2004-03-28

    This is a mini-review of recent theoretical work in the field of relativistic heavy ion physics. The following topics are discussed initial conditions and the Color Glass Condensate; approach to thermalization and the hydrodynamic evolution; hard probes and the properties of the Quark-Gluon Plasma. Some of the unsolved problems and potentially promising directions for future research are listed as well.

  3. Influence of sputtering pressure on the structural, optical and hydrophobic properties of sputtered deposited HfO{sub 2} coatings

    Energy Technology Data Exchange (ETDEWEB)

    Dave, V. [Department of Electrical Engineering, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Dubey, P. [Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Gupta, H.O. [Department of Electrical Engineering, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Chandra, R. [Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India)

    2013-12-31

    The aim of this work is to develop hydrophobic coatings for outdoor insulators using sputtering technique. Hafnium oxide is characterized by high dielectric constant, large band gap (5.6 eV), high refractive index (2.1) and good mechanical, thermal and chemical properties. Hence HfO{sub 2} is suitable as a protective coating for outdoor insulators used in the transmission line and transformers. Hafnium oxide coatings were deposited on glass substrates by DC magnetron sputtering technique at a sputtering pressure of 5 mTorr, 10 mTorr, 15 mTorr, 20 mTorr and 25 mTorr. The deposited films were characterized by techniques like X-ray diffraction (XRD), atomic force microscopy (AFM), water contact angle goniometry and UV–vis-NIR spectrophotometer. The average crystallite size calculated from XRD peaks shows that it increases with increase in sputtering pressure up to 15 mTorr and then it starts decreasing. The roughness calculated from AFM images shows the similar trend. The deposited films were found to be hydrophobic and transparent. The hydrophobicity of the films was correlated with the roughness calculated from AFM. The effect of sputtering pressure was also investigated on optical band gap and refractive index calculated from transmission and absorption data. The electrical resistivity was found to be high, thus ensuring insulating property of the deposited films. - Highlights: • Outdoor Insulators are suffering from environment pollution problem. • To mitigate problem, hydrophobic coating of HfO{sub 2} was synthesized by DC sputtering. • Effect of sputtering pressure was studied on structural, optical and hydrophobic properties of HfO{sub 2} • Optimum results were obtained at a sputtering pressure of 15 mTorr.

  4. Quark gluon plasma

    Indian Academy of Sciences (India)

    C P Singh

    2000-04-01

    Recent trends in the research of quark gluon plasma (QGP) are surveyed and the current experimental and theoretical status regarding the properties and signals of QGP is reported. We hope that the experiments commencing at relativistic heavy-ion collider (RHIC) in 2000 will provide a glimpse of the QGP formation.

  5. Influence of the sputtering pressure on the properties of transparent conducting zirconium-doped zinc oxide films prepared by RF magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    刘汉法; 张化福; 类成新; 袁长坤

    2009-01-01

    Transparent conducting zirconium-doped zinc oxide films with high transparency and relatively low re-sistivity have been successfully prepared on water-cooled glass substrate by radio frequency magnetron sputtering at room temperature. The Ar sputtering pressure was varied from 0.5 to 3 Pa. The crystallinity increases and the electri-cal resistivity decreases when the sputtering pressure increases from 0.5 to 2.5 Pa. The cystallinity decreases and the electrical resistivity increases when the sputtering pressure increases from 2.5 to 3 Pa. When the sputtering pressure The deposited films are polycrystalline with a hexagonal structure and a preferred orientation perpendicular to the substrate.

  6. Status of Plasma Physics Techniques for the Deposition of Tribological Coatings

    Science.gov (United States)

    Spalvins, T.

    1984-01-01

    The plasma physics deposition techniques of sputtering and ion-plating are reviewed. Their characteristics and potentials are discussed in terms of synthesis or deposition of tribological coatings. Since the glow discharge or plasma generated in the conventional sputtering and ion-plating techniques has a low ionization efficiency, rapid advances have been made in equipment design to further increase the ionization efficiency. The enhanced ionization favorably affects the nucleation and growth sequence of the coating. This leads to improved adherence and coherence, higher density, favorable morphological growth, and reduced internal stresses in the coatings. As a result, desirable coating characteristics can be precision tailored. Tribological coating characteristics of sputtered solid film lubricants such as MoS2, ion-plated soft gold and lead metallic films, and sputtered and ion-plated wear-resistant refractory compound films such as nitrides and carbides are discussed.

  7. Substrate Frequency Effects on Cr x N Coatings Deposited by DC Magnetron Sputtering

    Science.gov (United States)

    Obrosov, Aleksei; Naveed, Muhammad; Volinsky, Alex A.; Weiß, Sabine

    2016-11-01

    Controlled ion bombardment is a popular method to fabricate desirable coating structures and modify their properties. Substrate biasing at high frequencies is a possible technique, which allows higher ion density at the substrate compared with DC current bias. Moreover, high ion energy along with controlled adatom mobility would lead to improved coating growth. This paper focuses on a similar type of study, where effects of coating growth and properties of DC magnetron-sputtered chromium nitride (Cr x N) coatings at various substrate bias frequencies are discussed. Cr x N coatings were deposited by pulsed DC magnetron sputtering on Inconel 718 and (100) silicon substrates at 110, 160 and 280 kHz frequency at low duty cycle. Coating microstructure and morphology were studied by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), scratch adhesion testing and nanoindentation. Results indicate a transformation of columnar into glassy structure of Cr x N coatings with the substrate bias frequency increase. This transformation is attributed to preferential formation of the Cr2N phase at high frequencies compared with CrN at low frequencies. Increase in frequency leads to an increase in deposition rate, which is believed to be due to increase in plasma ion density and energy of the incident adatoms. An increase in coating hardness along with decrease in elastic modulus was observed at high frequencies. Scratch tests show a slight increase in coating adhesion, whereas no clear increase in coating roughness can be found with the substrate bias frequency.

  8. Novel high power impulse magnetron sputtering enhanced by an auxiliary electrical field.

    Science.gov (United States)

    Li, Chunwei; Tian, Xiubo

    2016-08-01

    The high power impulse magnetron sputtering (HIPIMS) technique is a novel highly ionized physical vapor deposition method with a high application potential. However, the electron utilization efficiency during sputtering is rather low and the metal particle ionization rate needs to be considerably improved to allow for a large-scale industrial application. Therefore, we enhanced the HIPIMS technique by simultaneously applying an electric field (EF-HIPIMS). The effect of the electric field on the discharge process was studied using a current sensor and an optical emission spectrometer. Furthermore, the spatial distribution of the electric potential and electric field during the EF-HIPIMS process was simulated using the ANSYS software. The results indicate that a higher electron utilization efficiency and a higher particle ionization rate could be achieved. The auxiliary anode obviously changed the distribution of the electric potential and the electric field in the discharge region, which increased the plasma density and enhanced the degree of ionization of the vanadium and argon gas. Vanadium films were deposited to further compare both techniques, and the morphology of the prepared films was investigated by scanning electron microscopy. The films showed a smaller crystal grain size and a denser growth structure when the electric field was applied during the discharge process.

  9. Effects of Various RF Powers on CdTe Thin Film Growth Using RF Magnetron Sputtering

    Science.gov (United States)

    Alibakhshi, Mohammad; Ghorannevis, Zohreh

    2016-09-01

    Cadmium telluride (CdTe) film was deposited using the magnetron sputtering system onto a glass substrate at various deposition times and radio frequency (RF) powers. Ar gas was used to generate plasma to sputter the CdTe atoms from CdTe target. Effects of two experimental parameters of deposition time and RF power were investigated on the physical properties of the CdTe films. X-ray Diffraction (XRD) analysis showed that the films exhibited polycrystalline nature of CdTe structure with the (111) orientation as the most prominent peak. Optimum condition to grow the CdTe film was obtained and it was found that increasing the deposition time and RF power increases the crystallinity of the films. From the profilometer and XRD data's, the thicknesses and crystal sizes of the CdTe films increased at the higher RF power and the longer deposition time, which results in affecting the band gap as well. From atomic force microscopy (AFM) analysis we found that roughnesses of the films depend on the deposition time and is independent of the RF power.

  10. Preparation of zinc tin oxide films by reactive magnetron sputtering of Zn on liquid Sn

    Energy Technology Data Exchange (ETDEWEB)

    Pau, J.L., E-mail: joseluis.pau@uam.e [Laboratorio de Microelectronica, Dept. de Fisica Aplicada, Universidad Autonoma de Madrid, c/ Francisco Tomas y Valiente 7, 28049 Madrid (Spain); Scheffler, L.; Hernandez, M.J.; Cervera, M.; Piqueras, J. [Laboratorio de Microelectronica, Dept. de Fisica Aplicada, Universidad Autonoma de Madrid, c/ Francisco Tomas y Valiente 7, 28049 Madrid (Spain)

    2010-09-30

    Zn is sputter-deposited on melted Sn films by radio-frequency magnetron sputtering in oxidizing plasma. The samples present an absorption cut-off wavelength close to the one of ZnO, and an optical transparency higher than 50% in the visible range. Ex-situ thermal annealing improves visible transparency and produces a slight blue-shift in the optical bandgap. X-ray diffraction patterns show typical spectra due to polycrystalline ZnO with evidence of the presence of crystalline SnO, before annealing, and Zn{sub 2}SnO{sub 4}, after annealing. Rutherford Backscattering studies reveal the existence of a ZnO layer on top of an O-rich (Zn, Sn)O thin film. After optimal thermal treatment, electrical characterization exhibits carrier concentrations of 10{sup 16}-10{sup 17} cm{sup -3} and mobilities of 20-80 cm{sup 2} V{sup -1} s{sup -1} for the resulting (Zn, Sn)O n-type films.

  11. A heavy load for heavy ions

    CERN Multimedia

    2003-01-01

    On 25 September, the two large coils for the dipole magnet of ALICE, the LHC experiment dedicated to heavy ions, arrived at Point 2 on two heavy load trucks after a 1200 km journey from their assembly in Vannes, France.

  12. Heavy hadron decays with conserved heavy flavour

    Energy Technology Data Exchange (ETDEWEB)

    Faller, Sven; Mannel, Thomas [Theoretische Physik 1, Naturwissenschaftlich-Technische Fakultaet, Universitaet Siegen, Walter-Flex-Strasse 3, D-57068 Siegen (Germany)

    2015-07-01

    We investigate the decays of heavy hadrons where the heavy quark acts as a spectator and the light quark decays in a weak transition. For these s → u or d → u decays we show that the decay rates can be reliably computed.

  13. Sputtered titanium oxynitride coatings for endosseous applications: Physical and chemical evaluation and first bioactivity assays

    Energy Technology Data Exchange (ETDEWEB)

    Banakh, Oksana, E-mail: oksana.banakh@he-arc.ch [Institute of Applied Microtechnologies, Haute Ecole Arc Ingénierie (HES-SO), Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland); Moussa, Mira, E-mail: mira.moussa@unige.ch [Laboratory of Biomaterials, University of Geneva, 19, rue Barthelemy Menn, CH-1205 Geneva (Switzerland); Matthey, Joel, E-mail: joel.matthey@he-arc.ch [Institute of Applied Microtechnologies, Haute Ecole Arc Ingénierie (HES-SO), Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland); Pontearso, Alessandro, E-mail: alessandro.pontearso@he-arc.ch [Institute of Applied Microtechnologies, Haute Ecole Arc Ingénierie (HES-SO), Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland); Cattani-Lorente, Maria, E-mail: maria.cattani-lorente@unige.ch [Laboratory of Biomaterials, University of Geneva, 19, rue Barthelemy Menn, CH-1205 Geneva (Switzerland); Sanjines, Rosendo, E-mail: rosendo.sanjines@epfl.ch [Ecole Polytechnique Fédérale de Lausanne (EPFL), Institute of Condensed Matter Physics, Station 3, CH-1015 Lausanne (Switzerland); Fontana, Pierre, E-mail: Pierre.Fontana@hcuge.ch [Haemostasis laboratory, Geneva University Hospital, Rue Gabrielle-Perret-Gentil 4, CH-1205 Geneva (Switzerland); Wiskott, Anselm, E-mail: anselm.wiskott@unige.ch [Laboratory of Biomaterials, University of Geneva, 19, rue Barthelemy Menn, CH-1205 Geneva (Switzerland); Durual, Stephane, E-mail: stephane.durual@unige.ch [Laboratory of Biomaterials, University of Geneva, 19, rue Barthelemy Menn, CH-1205 Geneva (Switzerland)

    2014-10-30

    Highlights: • Titanium oxynitride coatings (TiN{sub x}O{sub y}) with chemical composition ranging from TiN to TiO{sub 2} were deposited by magnetron sputtering from a metallic Ti target using a mixture of O{sub 2} + N{sub 2}. • The coatings structure as well as physical, chemical and mechanical properties progressively changes as a function of oxygen content in the TiN{sub x}O{sub y.} • All TiN{sub x}O{sub y} coatings show a significantly higher level of bioactivity as compared to bare Ti substrates (1.2 to 1.4 fold increase in cell proliferation). Despite variations in surface chemistry, topography and surface tension observed on films as a function of chemical composition, no significant differences in the films’ biological activity were observed after 3 days of testing. - Abstract: Titanium oxynitride coatings (TiN{sub x}O{sub y}) are considered a promising material for applications in dental implantology due to their high corrosion resistance, their biocompatibility and their superior hardness. Using the sputtering technique, TiN{sub x}O{sub y} films with variable chemical compositions can be deposited. These films may then be set to a desired value by varying the process parameters, that is, the oxygen and nitrogen gas flows. To improve the control of the sputtering process with two reactive gases and to achieve a variable and controllable coating composition, the plasma characteristics were monitored in-situ by optical emission spectroscopy. TiN{sub x}O{sub y} films were deposited onto commercially pure (ASTM 67) microroughened titanium plates by reactive magnetron sputtering. The nitrogen gas flow was kept constant while the oxygen gas flow was adjusted for each deposition run to obtain films with different oxygen and nitrogen contents. The physical and chemical properties of the deposited films were analyzed as a function of oxygen content in the titanium oxynitride. The potential application of the coatings in dental implantology was assessed by

  14. High-surface-quality nanocrystalline InN layers deposited on GaN templates by RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Valdueza-Felip, Sirona; Naranjo, Fernando B.; Gonzalez-Herraez, Miguel [Grupo de Ingenieria Fotonica, Departamento de Electronica, Escuela Politecnica Superior, Universidad de Alcala, Campus Universitario, 28871 Alcala de Henares, Madrid (Spain); Lahourcade, Lise; Monroy, Eva [Equipe mixte CEA-CNRS-UJF, Nanophysique et Semiconducteurs, INAC/SP2M/PSC, CEA-Grenoble, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Fernandez, Susana [Departamento de Energias Renovables, Energia Solar Fotovoltaica, Centro de Investigaciones Energeticas, Medioambientales y Tecnologicas (CIEMAT), Avda. Complutense 22, 28040 Madrid (Spain)

    2011-01-15

    We report a detailed study of the effect of deposition parameters on optical, structural, and morphological properties of InN films grown by reactive radio-frequency (RF) sputtering on GaN-on-sapphire templates in a pure nitrogen atmosphere. Deposition parameters under study are substrate temperature, RF power, and sputtering pressure. Wurtzite crystallographic structure with c-axis preferred growth orientation is confirmed by X-ray diffraction measurements. For the optimized deposition conditions, namely at a substrate temperature of 450 C and RF power of 30 W, InN films present a root-mean-square surface roughness as low as {proportional_to}0.4 nm, comparable to the underlying substrate. The apparent optical bandgap is estimated at 720 nm (1.7 eV) in all cases. However, the InN absorption band tail is strongly influenced by the sputtering pressure due to a change in the species of the plasma. (Copyright copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  15. STEM-EELS analysis reveals stable high-density He in nanopores of amorphous silicon coatings deposited by magnetron sputtering.

    Science.gov (United States)

    Schierholz, Roland; Lacroix, Bertrand; Godinho, Vanda; Caballero-Hernández, Jaime; Duchamp, Martial; Fernández, Asunción

    2015-02-20

    A broad interest has been showed recently on the study of nanostructuring of thin films and surfaces obtained by low-energy He plasma treatments and He incorporation via magnetron sputtering. In this paper spatially resolved electron energy-loss spectroscopy in a scanning transmission electron microscope is used to locate and characterize the He state in nanoporous amorphous silicon coatings deposited by magnetron sputtering. A dedicated MATLAB program was developed to quantify the helium density inside individual pores based on the energy position shift or peak intensity of the He K-edge. A good agreement was observed between the high density (∼35-60 at nm(-3)) and pressure (0.3-1.0 GPa) values obtained in nanoscale analysis and the values derived from macroscopic measurements (the composition obtained by proton backscattering spectroscopy coupled to the macroscopic porosity estimated from ellipsometry). This work provides new insights into these novel porous coatings, providing evidence of high-density He located inside the pores and validating the methodology applied here to characterize the formation of pores filled with the helium process gas during deposition. A similar stabilization of condensed He bubbles has been previously demonstrated by high-energy He ion implantation in metals and is newly demonstrated here using a widely employed methodology, magnetron sputtering, for achieving coatings with a high density of homogeneously distributed pores and He storage capacities as high as 21 at%.

  16. Improvement of the homogeneity of high mobility In{sub 2}O{sub 3}:H films by sputtering through a mesh electrode studied by Monte Carlo simulation and thin film analysis

    Energy Technology Data Exchange (ETDEWEB)

    Scherg-Kurmes, Harald; Hafez, Ahmad; Szyszka, Bernd [Technische Universitaet Berlin, Einsteinufer 25, 10587, Berlin (Germany); Siemers, Michael; Pflug, Andreas [Fraunhofer IST, Bienroder Weg 54E, 38108, Braunschweig (Germany); Schlatmann, Rutger [Helmholtz Zentrum Berlin, PVcomB, Schwarzschildstr. 3, 12489, Berlin (Germany); Rech, Bernd [Helmholtz Zentrum Berlin, Institute for Silicon Photovoltaics, Kekulestrasse 5, 12489, Berlin (Germany)

    2016-09-15

    Hydrogen-doped indium oxide (IOH) is a transparent conductive oxide offering great potential to optoelectronic applications because of its high mobility of over 100 cm{sup 2} V{sup -1}s{sup -1}. In films deposited statically by RF magnetron sputtering, a small area directly opposing the target center with a higher resistivity and lower crystallinity than the rest of the film has been found via hall- and XRD-measurements, which we attribute to plasma damage. In order to investigate the distribution of particle energies during the sputtering process we have simulated the RF-sputtering deposition process of IOH by particle-in-cell Monte Carlo (PICMC) simulation. At the surface of ceramic sputtering targets, negatively charged oxygen ions are created. These ions are accelerated toward the substrate in the plasma sheath with energies up to 150 eV. They damage the growing film and reduce its crystallinity. The influence of a negatively biased mesh inside the sputtering chamber on particle energies and distributions has been simulated and investigated. We found that the mesh decreased the high-energetic oxygen ion density at the substrate, thus enabling a more homogeneous IOH film growth. The theoretical results have been verified by XRD X-ray diffractometry (XRD), 4-point probe, and hall measurements of statically deposited IOH films on glass. (copyright 2016 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  17. Projectile charge state dependent sputtering of solid surfaces

    CERN Document Server

    Hayderer, G

    2000-01-01

    dependence on the ion kinetic energy. This new type of potential sputtering not only requires electronic excitation of the target material, but also the formation of a collision cascade within the target in order to initiate the sputtering process and has therefore been termed kinetically assisted potential sputtering. In order to study defects induced by potential sputtering on the atomic scale we performed measurements of multiply charged Ar ion irradiated HOPG (highly oriented pyrolitic graphite) samples with scanning tunneling microscopy (STM). The only surface defects found in the STM images are protrusions. The mean diameter of the defects increases with projectile charge state while the height of the protrusions stays roughly the same indicating a possible pre-equilibrium effect of the stopping of slow multiply charged projectiles in HOPG. Total sputter yields for impact of slow singly and multiply charged ions on metal- (Au), oxide- (Al2O3, MgO) and alkali-halide surfaces (LiF) have been measured as a...

  18. Sputtering of a metal nanofoam by Au ions

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Christian [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany); Bringa, Eduardo M. [CONICET, Mendoza 5500 (Argentina); Instituto de Ciencias Básicas, Universidad Nacional de Cuyo, Mendoza 5500 (Argentina); Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.de [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany)

    2015-01-01

    Porous materials, such as nanofoams, may react differently to irradiation than compact targets. This is caused by the influence of the cavities on the evolution of collision cascades, but also by the differing heat conduction which affects the spike phase. Using molecular dynamics simulation we study the sputtering of a Au nanofoam by 10 keV Au projectiles, and compare to the sputtering of a compact Au target. These bombardment conditions lead to a strong contribution of spikes to the sputtering process. We find the foam to sputter considerably less than the compact target; the open structure of the foam prevents the build-up of strong collision spike regions at the surface, which are the major source of sputtering in the compact target. Also emission takes a longer time scale in the foam, as particles need to travel longer pathways to be emitted. On the other hand, the molten phase is more extended in the foam and also exists for a longer time; this is caused by the reduced heat conductivity in this material.

  19. Nitinol: Tubing versus sputtered film - microcleanliness and corrosion behavior.

    Science.gov (United States)

    Wohlschlögel, Markus; Lima de Miranda, Rodrigo; Schüßler, Andreas; Quandt, Eckhard

    2016-08-01

    Corrosion behavior and microcleanliness of medical-device grade Nitinol tubing (Nix Ti1- x , x = 0.51; outer diameter 7 mm, wall thickness 0.5 mm), drawn from various ingot qualities, are compared to the characteristics of sputtered Nitinol film material (Nix Ti1- x , x = 0.51; thickness 50 µm). Electropolished tubing half-shell samples are tested versus as-received sputtered film samples. Inclusion size distributions are assessed using quantitative metallography and corrosion behavior is investigated by potentiodynamic polarization testing in phosphate-buffered saline at body temperature. For the sputtered film samples, the surface chemistry is additionally analyzed employing Auger Electron Spectroscopy (AES) composition-depth profiling. Results show that the fraction of breakdowns in the potentiodynamic polarization test correlates with number and size of the inclusions in the material. For the sputtered Nitinol film material no inclusions were detectable by light microscopy on the one hand and no breakdowns were found in the potentiodynamic polarization test on the other hand. As for electropolished Nitinol, the sputtered Nitinol film material reveals Nickel depletion and an Oxygen-to-Titanium intensity ratio of ∼2:1 in the surface oxide layer, as measured by AES. © 2015 Wiley Periodicals, Inc. J Biomed Mater Res Part B: Appl Biomater, 104B: 1176-1181, 2016.

  20. Fast charge exchange ions in high power impulse magnetron sputtering of titanium as probes for the electrical potential

    Science.gov (United States)

    Breilmann, W.; Maszl, C.; von Keudell, A.

    2017-03-01

    High power impulse magnetron sputtering (HiPIMS) plasmas exhibit a high ionization fraction of the sputtered material and ions with high kinetic energies, which produce thin films with superior quality. These ion energy distribution functions (IEDF) contain energetic peaks, which are believed to be linked to a distinct electrical potential hump {{Δ }}{{{Φ }}}{{ionization}{{zone}}} inside rotating localized ionization zones, so called spokes, at target power densities above 1 kW cm‑2. Any direct measurement of this electrical potential structure is, however, very difficult due to the dynamic nature of the spokes and the very high local power density, which hampers the use of conventional emissive probes. Instead, we use a careful analysis of the IEDFs for singly and doubly charged titanium ions from a HiPIMS plasma at varying target power density. The energy peaks in the IEDFs measured at the substrate depend on the point of ionization and any charge exchange collisions on the path between ionization and impact at the substrate. Thereby, the IEDFs contain a convoluted information about the electrical potential structure inside the plasma. The analysis of these IEDFs reveal that higher ionization states originate at high target power densities from the central part of the plasma spoke, whereas singly charged ions originate from the perimeter of the plasma spoke. Consequently, we observe different absolute ion energies with the energy of Ti2+ being slightly higher than two times the energy of Ti+. Additional peaks are observed in the IEDFs of Ti+ originating from charge exchange reactions from Ti2+ and Ti3+ with titanium neutrals. Based on this analysis of the IEDFs, the structure of the electrical potential inside a spoke is inferred yielding {{Δ }}{{{Φ }}}{{ionization}{{zone}}} = 25 V above the plasma potential, irrespective of target power density.