WorldWideScience

Sample records for plasma enhanced cvd

  1. Synthesis of carbon nanotubes by plasma-enhanced CVD process: gas phase study of synthesis conditions

    OpenAIRE

    Guláš, Michal; Cojocaru, Costel Sorin; Fleaca, Claudiu; Farhat, Samir; Veis, Pavel; Le Normand, Francois

    2008-01-01

    International audience; To support experimental investigations, a model based on ChemkinTM software was used to simulate gas phase and surface chemistry during plasma-enhanced catalytic CVD of carbon nanotubes. According to these calculations, gas phase composition, etching process and growth rates are calculated. The role of several carbon species, hydrocarbon molecules and ions in the growth mechanism of carbon nanotubes is presented in this study. Study of different conditions of gas phase ...

  2. Synthesis of carbon nanbotubes by plasma-enhanced CVD process: gas phase study of synthesis conditions

    Science.gov (United States)

    Guláš, M.; Cojocaru, C. S.; Fleaca, C. T.; Farhat, S.; Veis, P.; Le Normand, F.

    2008-09-01

    To support experimental investigations, a model based on Chemkin^TM software was used to simulate gas phase and surface chemistry during plasma-enhanced catalytic CVD of carbon nanotubes. According to these calculations, gas phase composition, etching process and growth rates are calculated. The role of several carbon species, hydrocarbon molecules and ions in the growth mechanism of carbon nanotubes is presented in this study. Study of different conditions of gas phase activation sources and pressure is performed.

  3. TiN coating on wall of holes and stitches by pulsed DC plasma enhanced CVD

    Institute of Scientific and Technical Information of China (English)

    马胜利; 徐可为; 介万奇

    2003-01-01

    TiN coating samples with narrow-stitch or deep-hole of different sizes and real dies with complex shape were processed by a larger-scale pulsed plasma enhanced CVD(PECVD) reactor. Scanning electron microscopy, optical microscopy, Vicker's hardness and interfacial adhesion tests were conducted to find the relation between the microstructure and properties of TiN coating on a flat and an inner surface. The results indicate that the inner-wall of holes (d>2 mm) and inner surface of narrow-stitches (d>3 mm) can be coated with the aid of pulsed DC plasma in an industrial-scale reactor. The quality of coatings on different surfaces is almost the same. The coating was applied to aluminum extrusion mould, and the mould life was increased at least by one time.

  4. Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD

    Energy Technology Data Exchange (ETDEWEB)

    Zhu Yuhe, E-mail: zyh1120@hotmail.co.jp [School of Stomatology, China Medical University, Shen Yang (China); Wang Wei; Jia Xingya [School of Stomatology, China Medical University, Shen Yang (China); Akasaka, Tsukasa [Department of Health Science, School of Dental Medicine Hokkaido University, Sapporo (Japan); Liao, Susan [School of Materials Science and Engineering, Nanyang Technological University (Singapore); Watari, Fumio [Department of Health Science, School of Dental Medicine Hokkaido University, Sapporo (Japan)

    2012-12-01

    Highlights: Black-Right-Pointing-Pointer Deposition of Titanium Carbide (TiC) layer on titanium (Ti) surface has been demonstrated by an ion-enhanced triode plasma chemical vapor deposition (CVD) method. Black-Right-Pointing-Pointer The Vickers hardness of surface carbide was more than 2000, which confirmed its high abrasion resistance. Black-Right-Pointing-Pointer Physical and mechanical properties of the deposited TiC film on Ti were investigated to examine its potential application as an abrasion resistant implant material. - Abstract: Deposition of titanium carbide (TiC) layer on titanium (Ti) surface has been demonstrated by an ion-enhanced triode plasma chemical vapor deposition (CVD) method using a TiCl{sub 4} + CH{sub 4} + H{sub 2} gas mixture. Physical and mechanical properties of the deposited TiC film on Ti were investigated to examine its potential application as an abrasion resistant implant material. X-ray diffraction (XRD) showed that the specimen was consisted of TiC and Ti. Carbide layer of about 6 {mu}m thickness was observed on the cross section of the specimen by scanning electron microscopy (SEM). The Vickers hardness of surface carbide was more than 2000, which confirmed its high abrasion resistance.

  5. Growth and characterization of nanodiamond layers prepared using the plasma-enhanced linear antennas microwave CVD system

    Energy Technology Data Exchange (ETDEWEB)

    Fendrych, Frantisek; Taylor, Andrew; Peksa, Ladislav; Kratochvilova, Irena; Kluiber, Zdenek; Fekete, Ladislav [Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i, Na Slovance 2, CZ-18221 Prague 8 (Czech Republic); Vlcek, Jan [Department of Physics and Measurement, Institute of Chemical Technology Prague, Technicka 5, CZ-16628 Prague 6 (Czech Republic); Rezacova, Vladimira; Petrak, Vaclav [Faculty of Biomedical Engineering, Czech Technical University, Sitna 3105, CZ-27201 Kladno 2 (Czech Republic); Liehr, Michael [Leybold Optics Dresden GmbH, Zur Wetterwarte 50, D-01109 Dresden (Germany); Nesladek, Milos, E-mail: fendrych@fzu.c [IMOMEC division, IMEC, Institute for Materials Research, University Hasselt, Wetenschapspark 1, B-3590 Diepenbeek (Belgium)

    2010-09-22

    Industrial applications of plasma-enhanced chemical vapour deposition (CVD) diamond grown on large area substrates, 3D shapes, at low substrate temperatures and on standard engineering substrate materials require novel plasma concepts. Based on the pioneering work of the group at AIST in Japan, the high-density coaxial delivery type of plasmas has been explored (Tsugawa et al 2006 New Diamond Front. Carbon Technol. 16 337-46). However, an important challenge is to obtain commercially interesting growth rates at very low substrate temperatures. In this work we introduce the concept of novel linear antenna sources, designed at Leybold Optics Dresden, using high-frequency pulsed MW discharge with a high plasma density. This type of pulse discharges leads to the preparation of nanocrystalline diamond (NCD) thin films, compared with ultra-NCD thin films prepared in (Tsugawa et al 2006 New Diamond Front. Carbon Technol. 16 337-46). We present optical emission spectroscopy data for the CH{sub 4}-CO{sub 2}-H{sub 2} gas chemistry and we discuss the basic properties of the NCD films grown.

  6. Influence of deposition rate on the structural properties of plasma-enhanced CVD epitaxial silicon

    Science.gov (United States)

    Chen, Wanghua; Cariou, Romain; Hamon, Gwenaëlle; Léal, Ronan; Maurice, Jean-Luc; Cabarrocas, Pere Roca i

    2017-01-01

    Solar cells based on epitaxial silicon layers as the absorber attract increasing attention because of the potential cost reduction. In this work, we studied the influence of the deposition rate on the structural properties of epitaxial silicon layers produced by plasma-enhanced chemical vapor deposition (epi-PECVD) using silane as a precursor and hydrogen as a carrier gas. We found that the crystalline quality of epi-PECVD layers depends on their thickness and deposition rate. Moreover, increasing the deposition rate may lead to epitaxy breakdown. In that case, we observe the formation of embedded amorphous silicon cones in the epi-PECVD layer. To explain this phenomenon, we develop a model based on the coupling of hydrogen and built-in strain. By optimizing the deposition conditions to avoid epitaxy breakdown, including substrate temperatures and plasma potential, we have been able to synthesize epi-PECVD layers up to a deposition rate of 8.3 Å/s. In such case, we found that the incorporation of hydrogen in the hydrogenated crystalline silicon can reach 4 at. % at a substrate temperature of 350 °C. PMID:28262840

  7. Simultaneous synthesis of nanodiamonds and graphene via plasma enhanced chemical vapor deposition (MW PE-CVD) on copper.

    Science.gov (United States)

    Gottlieb, Steven; Wöhrl, Nicolas; Schulz, Stephan; Buck, Volker

    2016-01-01

    The simultaneous growth of both nanodiamonds and graphene on copper samples is described for the first time. A PE-CVD process is used to synthesize graphene layers and nanodiamond clusters from a hydrogen/methane gas mixture as it is typically done successfully in thermal CVD processes for graphene synthesis. However, the standard thermal CVD process is not without problems since the deposition of graphene is affected by the evaporation of a notable amount of copper caused by the slow temperature increase typical for thermal CVD resulting in a long process time. In sharp contrast, the synthesis of graphene by PE-CVD can circumvent this problem by substantially shortening the process time at holding out the prospect of a lower substrate temperature. The reduced thermal load and the possibility to industrially scale-up the PE-CVD process makes it a very attractive alternative to the thermal CVD process with respect to the graphene production in the future. Nanodiamonds are synthesized in PE-CVD reactors for a long time because these processes offer a high degree of control over the film's nanostructure and simultaneously providing a significant high deposition rate. To model the co-deposition process, the three relevant macroscopic parameters (pressure, gas mixture and microwave power) are correlated with three relevant process properties (plasma ball size, substrate temperature and C2/Hα-ratio) and the influence on the quality of the deposited carbon allotropes is investigated. For the evaluation of the graphene as well as the nanodiamond quality, Raman spectroscopy used whereas the plasma properties are measured by optical methods. It is found that the diamond nucleation can be influenced by the C2/Hα-ratio in the plasma, while the graphene quality remains mostly unchanged by this parameter. Moreover it is derived from the experimental data that the direct plasma contact with the copper surface is beneficial for the nucleation of the diamond while the growth and

  8. Synthesis of few-layer graphene on a Ni substrate by using DC plasma enhanced chemical vapor deposition (PE-CVD)

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Jeong Hyuk; Castro, Edward Joseph; Hwang, Yong Gyoo; Lee, Choong Hun [Wonkwang University, Iksan (Korea, Republic of)

    2011-01-15

    In this work, few-layer graphene (FLG) was successfully grown on polycrystalline Ni a large scale by using DC plasma enhanced chemical vapor deposition (DC PE-CVD), which may serve as an alternative route in large-scale graphene synthesis. The synthesis time had an effect on the quality of the graphene produced. The applied DC voltage, on the other hand, influenced the minimization of the defect densities in the graphene grown. We also present a method of producing a free-standing polymethyl methacrylate (PMMA)/graphene membrane on a FeCl{sub 3(aq)} solution, which could then be transferred to the desired substrate.

  9. Metallo–organic compound-based plasma enhanced CVD of ZrO2 films for microelectronic applications

    Indian Academy of Sciences (India)

    S Chatterjee; S K Samanta; H D Banerjee; C K Maiti

    2001-12-01

    ZrO2 films on silicon wafer were deposited by microwave plasma enhanced chemical vapour deposition technique using zirconium tetratert butoxide (ZTB). The structure and composition of the deposited layers were studied by fourier transform infrared spectroscopy (FTIR). The deposition rates were also studied. MOS capacitors fabricated using deposited oxides were used to characterize the electrical properties of ZrO2 films. The films showed their suitability for microelectronic applications.

  10. Preparation and Characterization of DLC Films by Twinned ECR Microwave Plasma Enhanced CVD for Microelectromechanical Systems (MEMS) Applications

    Institute of Scientific and Technical Information of China (English)

    LI Xin; TANG Zhen-an; DENG Xin-lu; SHEN Yu-xiu; DING Hai-tao

    2004-01-01

    Diamond-like carbon (DLC) films have recently been pursued as the protection of MEMS against their friction and wear.Plasma enhanced chemical vapor deposition (PECVD) technique is very attractive to prepare DLC coating for MEMS.This paper describes the preparation of DLC films using twinned electron cyclotron resonance (ECR) microwave PECVD process.Raman spectra confirmed the DLC characteristics of the films.Fourier-transform infrared (FT-IR)characterization indicates the carbon is bonded in the form sp3 and sp2 with hydrogen participating in bonding.The surface roughness of the films is as low as approximately 0.093nm measured with an atomic force microscope.A CERT microtribometer system is employed to obtain information about the scratch resistance,friction properties,and sliding wear resistance of the films.The results show the deposited DLC films have low friction and good scratch/wear resistance properties.

  11. Effect of Hydrogen Dilution on Growth of Silicon Nanocrystals Embedded in Silicon Nitride Thin Film bv Plasma-Enhanced CVD

    Institute of Scientific and Technical Information of China (English)

    DING Wenge; ZHEN Lanfang; ZHANG Jiangyong; LI Yachao; YU Wei; FU Guangsheng

    2007-01-01

    An investigation was conducted into the effect of hydrogen dilution on the mi-crostructure and optical properties of silicon nanograins embedded in silicon nitride (Si/SiNx) thin film deposited by the helicon wave plasma-enhanced chemical vapour deposition technique. With Ar-diluted SiH4 and N2 as the reactant gas sources in the fabrication of thin film, the film was formed at a high deposition rate. There was a high density of defect at the amorphous silicon (a-Si)/SiNx interface and a relative low optical gap in the film. An addition of hydrogen into the reactant gas reduced the film deposition rate sharply. The silicon nanograins in the SiNx matrix were in a crystalline state, and the density of defects at the silicon nanocrystals (nc-Si)/SiNx interface decreased significantly and the optical gap of the films widened. These results suggested that hydrogen activated by the plasma could not only eliminate in the defects between the interface of silicon nanograins and SiNx matrix, but also helped the nanograins transform from the amorphous into crystalline state. By changing the hydrogen dilution ratio in the reactant gas sources, a tunable band gap from 1.87 eV to 3.32 eV was obtained in the Si/SiNx film.

  12. Investigation of the Millimeter-Wave Plasma Assisted CVD Reactor

    Energy Technology Data Exchange (ETDEWEB)

    Vikharev, A; Gorbachev, A; Kozlov, A; Litvak, A; Bykov, Y; Caplan, M

    2005-07-21

    A polycrystalline diamond grown by the chemical vapor deposition (CVD) technique is recognized as a unique material for high power electronic devices owing to unrivaled combination of properties such as ultra-low microwave absorption, high thermal conductivity, high mechanical strength and chemical stability. Microwave vacuum windows for modern high power sources and transmission lines operating at the megawatt power level require high quality diamond disks with a diameter of several centimeters and a thickness of a few millimeters. The microwave plasma-assisted CVD technique exploited today to produce such disks has low deposition rate, which limits the availability of large size diamond disk windows. High-electron-density plasma generated by the millimeter-wave power was suggested for enhanced-growth-rate CVD. In this paper a general description of the 30 GHz gyrotron-based facility is presented. The output radiation of the gyrotron is converted into four wave-beams. Free localized plasma in the shape of a disk with diameter much larger than the wavelength of the radiation is formed in the intersection area of the wave-beams. The results of investigation of the plasma parameters, as well as the first results of diamond film deposition are presented. The prospects for commercially producing vacuum window diamond disks for high power microwave devices at much lower costs and processing times than currently available are outlined.

  13. Influence of growth conditions on microstructure and defects in diamond coatings grown by microwave plasma enhanced CVD

    Indian Academy of Sciences (India)

    Kalyan Sundar Pal; Sandip Bysakh; Awadesh Kumar Mallik; Nandadulal Dandapat; Someswar Datta; Bichitra K Guha

    2015-06-01

    Diamond coatings were grown on SiO2/Si substrate under various process conditions by microwave plasma chemical vapour deposition (MPCVD) using CH4/H2 gas mixture. In this paper, we present a microstructural study to elucidate on the growth mechanism and evolution of defects, viz., strain, dislocations, stacking faults, twins and non-diamond impurities in diamond coatings grown under different process conditions. Transmission electron microscopy (TEM), X-ray diffraction (XRD) and Raman spectroscopy were used to characterize the diamond coatings. It has been shown that our new approach of prolonged substrate pre-treatment under hydrogen plasma yielded a new growth sequence that the SiO2 layer on the Si substrate was first reduced to yield Si layer of ∼150 nm thickness before diamond was allowed to grow under CH4–H2 plasma, created subsequently. It has also been shown that Si and O as impurity from the substrate hinders the initial diamond growth to yield non-diamond phases. It is being suggested that the crystal defects like twins, stacking faults, dislocations in the diamond grains and dislocations in the intermediate Si layer are generated due to the development of non-uniform stresses during diamond growth at high temperature.

  14. Surface analysis of CVD diamond exposed to fusion plasma

    NARCIS (Netherlands)

    Porro, S.; De Temmerman, G.; MacLaren, D. A.; Lisgo, S.; Rudakov, D. L.; Westerhout, J.; Wiora, M.; John, P.; Villalpando, I.; Wilson, J. I. B.

    2010-01-01

    Microcrystalline undoped and heavily boron-doped polycrystalline diamond layers have been deposited on various substrates by hot filament CVD and exposed to hydrogen plasma in a linear plasma reactor (Pilot-PSI, The Netherlands) that simulates the high flux and high density plasma conditions of toka

  15. Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD).

    Science.gov (United States)

    Böke, Frederik; Giner, Ignacio; Keller, Adrian; Grundmeier, Guido; Fischer, Horst

    2016-07-20

    Densely sintered aluminum oxide (α-Al2O3) is chemically and biologically inert. To improve the interaction with biomolecules and cells, its surface has to be modified prior to use in biomedical applications. In this study, we compared two deposition techniques for adhesion promoting SiOx films to facilitate the coupling of stable organosilane monolayers on monolithic α-alumina; physical vapor deposition (PVD) by thermal evaporation and plasma enhanced chemical vapor deposition (PE-CVD). We also investigated the influence of etching on the formation of silanol surface groups using hydrogen peroxide and sulfuric acid solutions. The film characteristics, that is, surface morphology and surface chemistry, as well as the film stability and its adhesion properties under accelerated aging conditions were characterized by means of X-ray photoelectron spectroscopy (XPS), energy dispersive X-ray spectroscopy (EDX), scanning electron microscopy (SEM), inductively coupled plasma-optical emission spectroscopy (ICP-OES), and tensile strength tests. Differences in surface functionalization were investigated via two model organosilanes as well as the cell-cytotoxicity and viability on murine fibroblasts and human mesenchymal stromal cells (hMSC). We found that both SiOx interfaces did not affect the cell viability of both cell types. No significant differences between both films with regard to their interfacial tensile strength were detected, although failure mode analyses revealed a higher interfacial stability of the PE-CVD films compared to the PVD films. Twenty-eight day exposure to simulated body fluid (SBF) at 37 °C revealed a partial delamination of the thermally deposited PVD films whereas the PE-CVD films stayed largely intact. SiOx layers deposited by both PVD and PE-CVD may thus serve as viable adhesion-promoters for subsequent organosilane coupling agent binding to α-alumina. However, PE-CVD appears to be favorable for long-term direct film exposure to aqueous

  16. Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system: the effect of different gas mixtures

    Energy Technology Data Exchange (ETDEWEB)

    Mao, M; Bogaerts, A, E-mail: ming.mao@ua.ac.b [Research Group PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, B-2610 Antwerp (Belgium)

    2010-05-26

    A hybrid model, called the hybrid plasma equipment model (HPEM), was used to study an inductively coupled plasma in gas mixtures of H{sub 2} or NH{sub 3} with CH{sub 4} or C{sub 2}H{sub 2} used for the synthesis of carbon nanotubes or carbon nanofibres (CNTs/CNFs). The plasma properties are discussed for different gas mixtures at low and moderate pressures, and the growth precursors for CNTs/CNFs are analysed. It is found that C{sub 2}H{sub 2}, C{sub 2}H{sub 4} and C{sub 2}H{sub 6} are the predominant molecules in CH{sub 4} containing plasmas besides the feedstock gas, and serve as carbon sources for CNT/CNF formation. On the other hand, long-chain hydrocarbons are observed in C{sub 2}H{sub 2}-containing plasmas. Furthermore, the background gases CH{sub 4} and C{sub 2}H{sub 2} show a different decomposition rate with H{sub 2} or NH{sub 3} addition at moderate pressures.

  17. Synthesis of graphene by cobalt-catalyzed decomposition of methane in plasma-enhanced CVD: Optimization of experimental parameters with Taguchi method

    Science.gov (United States)

    Mehedi, H.-A.; Baudrillart, B.; Alloyeau, D.; Mouhoub, O.; Ricolleau, C.; Pham, V. D.; Chacon, C.; Gicquel, A.; Lagoute, J.; Farhat, S.

    2016-08-01

    This article describes the significant roles of process parameters in the deposition of graphene films via cobalt-catalyzed decomposition of methane diluted in hydrogen using plasma-enhanced chemical vapor deposition (PECVD). The influence of growth temperature (700-850 °C), molar concentration of methane (2%-20%), growth time (30-90 s), and microwave power (300-400 W) on graphene thickness and defect density is investigated using Taguchi method which enables reaching the optimal parameter settings by performing reduced number of experiments. Growth temperature is found to be the most influential parameter in minimizing the number of graphene layers, whereas microwave power has the second largest effect on crystalline quality and minor role on thickness of graphene films. The structural properties of PECVD graphene obtained with optimized synthesis conditions are investigated with Raman spectroscopy and corroborated with atomic-scale characterization performed by high-resolution transmission electron microscopy and scanning tunneling microscopy, which reveals formation of continuous film consisting of 2-7 high quality graphene layers.

  18. Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure

    Science.gov (United States)

    Zajíčková, Lenka; Jelínek, Petr; Obrusník, Adam; Vodák, Jiří; Nečas, David

    2017-03-01

    In this contribution, we focus on the general problems of plasma-enhanced chemical vapor deposition in atmospheric pressure dielectric barrier discharges, i.e. deposition uniformity, film roughness and the formation of dust particles, and demonstrate them on the example of carboxyl coatings prepared by co-polymerization of acetylene and maleic anhydride. Since the transport of monomers at atmospheric pressure is advection-driven, special attention is paid to the gas dynamics simulations, gas flow patterns, velocity and residence time. By using numerical simulations, we design an optimized gas supply geometry capable of synthesizing uniform layers. The selection of the gas mixture containing acetylene was motivated by two of its characteristics: (i) suppression of filaments in dielectric barrier discharges, and (ii) improved film cross-linking, keeping the amount of functional groups high. However, acetylene discharges are prone to the formation of nanoparticles that can be incorporated into the deposited films, leading to their high roughness. Therefore, we also discuss the role of the gas composition, the spatial position of the substrate with respect to gas flow and the deposition time on the topography of the deposited films.

  19. Oriented carbon nanostructures grown by hot-filament plasma-enhanced CVD from self-assembled Co-based catalyst on Si substrates

    Science.gov (United States)

    Fleaca, Claudiu Teodor; Morjan, Ion; Rodica, Alexandrescu; Dumitrache, Florian; Soare, Iuliana; Gavrila-Florescu, Lavinia; Sandu, Ion; Dutu, Elena; Le Normand, François; Faerber, Jacques

    2012-03-01

    We report the synthesis of coral- and caterpillar-like carbon nanostructures assemblies starting from cobalt nitrate ethanol solutions deposited by drop-casting onto blank or carbon nanoparticles film covered Si(1 0 0) substrates. The seeded films were pre-treated with glow discharge hydrogen plasma aided by hot-filaments at 550 °C followed by introduction of acetylene at 700 °C. The resultant carbon nanostructure assemblies contain a high density of aligned carbon nanotubes/nanofibers (CNTs/CNFs). The influence of the forces that act during liquid-mediated self-assembly of Co catalyst precursor is discussed.

  20. High-rate diamond deposition by microwave plasma CVD

    Science.gov (United States)

    Li, Xianglin

    In this dissertation, the growth of CVD (Chemical Vapor Deposition) diamond thin films is studied both theoretically and experimentally. The goal of this research is to deposit high quality HOD (Highly Oriented Diamond) films with a growth rate greater than 1 mum/hr. For the (100)-oriented HOD films, the growth rate achieved by the traditional process is only 0.3 mum/hr while the theoretical limit is ˜0.45 mum/hr. This research increases the growth rate up to 5.3 mum/hr (with a theoretical limit of ˜7 mum/hr) while preserving the crystal quality. This work builds a connection between the theoretical study of the CVD process and the experimental research. The study is extended from the growth of regular polycrystalline diamond to highly oriented diamond (HOD) films. For the increase of the growth rate of regular polycrystalline diamond thin films, a scaling growth model developed by Goodwin is introduced in details to assist in the understanding of the MPCVD (Microwave Plasma CVD) process. Within the Goodwin's scaling model, there are only four important sub-processes for the growth of diamond: surface modification, adsorption, desorption, and incorporation. The factors determining the diamond growth rate and film quality are discussed following the description of the experimental setup and process parameters. Growth rate and crystal quality models are reviewed to predict and understand the experimental results. It is shown that the growth rate of diamond can be increased with methane input concentration and the amount of atomic hydrogen (by changing the total pressure). It is crucial to provide enough atomic hydrogen to conserve crystal quality of the deposited diamond film. The experimental results demonstrate that for a fixed methane concentration, there is a minimum pressure for growth of good diamond. Similarly, for a fixed total pressure, there is a maximum methane concentration for growth of good diamond, and this maximum methane concentration increases

  1. Analysis of Residual Thermal Stress in CVD-W Coating as Plasma Facing Material

    Institute of Scientific and Technical Information of China (English)

    朱大焕; 王坤; 王先平; 陈俊凌; 方前锋

    2012-01-01

    Chemical vapor deposition-tungsten (CVD-W) coating covering the surface of the plasma facing component (PFC) is an effective method to implement the tungsten material as plasma facing material (PFM) in fusion devices. Residual thermal stress in CVD-W coating due to thermal mismatch between coating and substrate was successfully simulated by using a finite element method (ANSYS 10.0 code). The deposition parametric effects, i.e., coating thickness and deposition temperature, and interlayer were investigated to get a description of the residual thermal stress in the CVD-W coating-substrate system. And the influence of the substrate materials on the generation of residual thermal stress in the CVD-W coating was analyzed with respect to the CVD-W coating application as PFM. This analysis is beneficial for the preparation and application of CVD-W coating.

  2. Analysis of Residual Thermal Stress in CVD-W Coating as Plasma Facing Material

    Science.gov (United States)

    Zhu, Dahuan; Wang, Kun; Wang, Xianping; Chen, Junling; Fang, Qianfeng

    2012-07-01

    Chemical vapor deposition-tungsten (CVD-W) coating covering the surface of the plasma facing component (PFC) is an effective method to implement the tungsten material as plasma facing material (PFM) in fusion devices. Residual thermal stress in CVD-W coating due to thermal mismatch between coating and substrate was successfully simulated by using a finite element method (ANSYS 10.0 code). The deposition parametric effects, i.e., coating thickness and deposition temperature, and interlayer were investigated to get a description of the residual thermal stress in the CVD-W coating-substrate system. And the influence of the substrate materials on the generation of residual thermal stress in the CVD-W coating was analyzed with respect to the CVD-W coating application as PFM. This analysis is beneficial for the preparation and application of CVD-W coating.

  3. Influence of hydrogen dilution on structural, electrical and optical properties of hydrogenated nanocrystalline silicon (nc-Si:H) thin films prepared by plasma enhanced chemical vapour deposition (PE-CVD)

    Energy Technology Data Exchange (ETDEWEB)

    Funde, A.M.; Bakr, Nabeel Ali; Kamble, D.K. [School of Energy Studies, University of Pune, Pune 411 007 (India); Hawaldar, R.R.; Amalnerkar, D.P. [Center for Materials for Electronics Technology (C-MET), Panchawati, Pune 411 008 (India); Jadkar, S.R. [Department of Physics, University of Pune, Ganeshkhind Road, Pune 411 007 (India)

    2008-10-15

    Hydrogenated nanocrystalline silicon (nc-Si:H) thin films were deposited from pure silane (SiH{sub 4}) and hydrogen (H{sub 2}) gas mixture by conventional plasma enhanced chemical vapour deposition (PE-CVD) method at low temperature (200 C) using high rf power. The structural, optical and electrical properties of these films are carefully and systematically investigated as a function of hydrogen dilution of silane (R). Characterization of these films with low angle X-ray diffraction and Raman spectroscopy revealed that the crystallite size in the films tends to decrease and at same time the volume fraction of crystallites increases with increase in R. The Fourier transform infrared (FTIR) spectroscopic analysis showed at low values of R, the hydrogen is predominantly incorporated in the nc-Si:H films in the mono-hydrogen (Si-H) bonding configuration. However, with increasing R the hydrogen bonding in nc-Si:H films shifts from mono-hydrogen (Si-H) to di-hydrogen (Si-H{sub 2}) and (Si-H{sub 2}){sub n} complexes. The hydrogen content in the nc-Si:H films decreases with increase in R and was found less than 10 at% over the entire studied range of R. On the other hand, the Tauc's optical band gap remains as high as 2 eV or much higher. The quantum size effect may responsible for higher band gap in nc-Si:H films. A correlation between electrical and structural properties has been found. For optimized deposition conditions, nc-Si:H films with crystallite size {proportional_to}7.67 nm having good degree of crystallinity ({proportional_to}84%) and high band gap (2.25 eV) were obtained with a low hydrogen content (6.5 at%). However, for these optimized conditions, the deposition rate was quite small (1.6 Aa/s). (author)

  4. The optoelectronic properties of silicon films deposited by inductively coupled plasma CVD

    Energy Technology Data Exchange (ETDEWEB)

    Qin Yanli; Yan Hengqing; Li Fei; Qiao Li; Liu Qiming [Department of Physics, Lanzhou University, Lanzhou 730000 (China); He Deyan, E-mail: hedy@lzu.edu.cn [Department of Physics, Lanzhou University, Lanzhou 730000 (China)

    2010-11-15

    Hydrogenated amorphous and microcrystalline silicon films were deposited by inductively coupled plasma chemical vapor deposition (ICP-CVD) at low substrate temperatures using H{sub 2}-diluted SiH{sub 4} as a source gas. High-density plasma generated by inductively coupled excitation facilitates the crystallization of silicon films at low temperatures, and microcrystalline silicon films were obtained at the substrate temperature as low as 180 deg. C. The columnar structure of the films becomes more and more compact with an increase of their crystallinity. The reduction of hydrogen content in the films causes a narrowing of the optical bandgap and an enhancement of the absorption with increasing the substrate temperature. The microcrystalline silicon films show two electronic transport mechanisms: one is related to the density of state distribution in the temperature region near room temperature and the other is the variable range hopping between localized electronic states close to the Fermi level below 170 K. A reasonable explanation is presented for the dependence of the optoelectronic properties on the microstructure of the silicon films. The films prepared at a substrate temperature of 300 deg. C have highly crystalline and compact columnar structure, high optical absorption coefficient and electrical conductivity, and a low hydrogen content of 3.8%.

  5. Enhancement of the Electrical Properties of CVD-Grown Graphene with Ascorbic Acid Treatment

    Science.gov (United States)

    Tang, Chunmiao; Chen, Zhiying; Zhang, Haoran; Zhang, Yaqian; Zhang, Yanhui; Sui, Yanping; Yu, Guanghui; Cao, Yijiang

    2016-02-01

    Ascorbic acid was used to modify to chemical vapor deposition (CVD)-grown graphene films transferred onto SiO2 substrate. Residual polymer (polymethyl methacrylate), Fe3+, Cl-, H2O, and O2 affected the electrical and thermal properties on graphene during the transfer or device fabrication processes. Exposure of transferred graphene to ascorbic acid resulted in significantly enhanced electrical properties with increased charge carrier mobility. All devices exhibited more than 30% improvement in room temperature carrier mobility in air. The carrier mobility of the treated graphene did not significantly decrease in 21 days. This result can be attributed to electron donation to graphene through the -OH functional group in ascorbic acid that is absorbed in graphene. This work provides a method to enhance the electrical properties of CVD-grown graphene.

  6. Laser diagnostics and modeling of plasma assisted CVD. Final technical report

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1996-02-01

    Plasma assisted chemical vapor deposition (PACVD) represents a novel approach for utilizing the nonequilibrium effects of reactive plasmas for depositing a wide range of protective hardface coatings that have both wear and erosion application. The nonequilibrium plasma is the heart of this complex system and has the function of generating the reactive molecular fragments (radicals) and atomic species at concentration levels unattainable by other competing processes. It is now widely accepted that such advanced protective hardface coatings materials will play a vital role in the energy technologies of the coming decades, with major applications in diverse areas ranging from aerospace and commercial propulsion systems (jet engines) to automotive components and internal combustion engines, (ceramic heat engines), cutting and machining tools, electronic packaging, thermal management, and possibly room-temperature superconductors. Wear and associated erosion aspects are responsible for an enormous expenditure of energy and fiscal resources in almost all DOE applications. Many of the results from this investigation arc also applicable to other materials processing reactors such as electron beam, PVD, CVD, laser ablation, microwave, high energy cathodic arc, thermal plasma (rf or dc) and combustion spray. These also include the various hybrid systems such as the rf/dc arc as used in Japan for diamond deposition and e-beam PVD deposition of advanced titanium alloy coatings as used at the Paton Institute in Kiev, Ukraine.

  7. CO{sub 2} laser-induced plasma CVD synthesis of diamond

    Energy Technology Data Exchange (ETDEWEB)

    Konov, V.I.; Prokhorov, A.M.; Uglov, S.A.; Bolshakov, A.P.; Leontiev, I.A. [Rossijskaya Akademiya Nauk, Moscow (Russian Federation). Inst. Obshchej Fiziki; Dausinger, F.; Huegel, H.; Angstenberger, B. [Institute of High Power Beam Technology (IFSW), Stuttgart University, Pfaffenwaldring 43, D-70569 Stuttgart (Germany); Sepold, G.; Metev, S. [Bremen Institute of Applied Beam Technology, D-28800 Bremen 33, Klagenfurter Str. 2 (Germany)

    1998-05-01

    A novel technique for CVD synthesis of materials that does not demand a vacuum chamber and provides high deposition rates has been developed. It is based on CO{sub 2} laser maintenance of a stationary optical discharge in a gas stream, exhausting over a substrate into the air (laser plasmatron). Nano- and polycrystalline-diamond films were deposited on tungsten substrates from atmospheric-pressure Xe(Ar):H{sub 2}:CH{sub 4} gas mixtures at flow rates of 2 l/min. A 2.5-kW CO{sub 2} laser focused beam produced plasma. The deposition area was about 1 cm{sup 2} and growth rates were up to 30-50 {mu}m/h. Peculiarities and advantages of laser plasmatrons are discussed. (orig.) With 4 figs., 4 refs.

  8. FABRICATION OF CNTS BY TOLUENE DECOMPOSITION IN A NEW REACTOR BASED ON AN ATMOSPHERIC PRESSURE PLASMA JET COUPLED TO A CVD SYSTEM

    Directory of Open Access Journals (Sweden)

    FELIPE RAMÍREZ-HERNÁNDEZ

    2017-03-01

    Full Text Available Here, we present a method to produce carbon nanotubes (CNTs based on the coupling between two conventional techniques used for the preparation of nanostructures: an arc-jet as a source of plasma and a chemical vapour deposition (CVD system. We call this system as an “atmospheric pressure plasma (APP-enhanced CVD” (APPE-CVD. This reactor was used to grow CNTs on non-flat aluminosilicate substrates by the decomposition of toluene (carbon source in the presence of ferrocene (as a catalyst. Both, CNTs and by-products of carbon were collected at three different temperatures (780, 820 and 860 °C in different regions of the APPE-CVD system. These samples were analysed by thermogravimetric analysis (TGA and DTG, scanning electron microscopy (SEM and Raman spectroscopy in order to determine the effect of APP on the thermal stability of the as-grown CNTs. It was found that the amount of metal catalyst in the synthesised CNTs is reduced by applying APP, being 820 °C the optimal temperature to produce CNTs with a high yield and carbon purity (95 wt. %. In contrast, when the synthesis temperature was fixed at 780 °C or 860 °C, amorphous carbon or CNTs with different structural defects, respectively, was formed through APEE-CVD reactor. We recommended the use of non-flat aluminosilicate particles as supports to increase CNT yield and facilitate the removal of deposits from the substrate surface. The approach that we implemented (to synthesise CNTs by using the APPE-CVD reactor may be useful to produce these nanostructures on a gram-scale for use in basic studies. The approach may also be scaled up for mass production.

  9. Giant enhancement in vertical conductivity of stacked CVD graphene sheets by self-assembled molecular layers

    Science.gov (United States)

    Liu, Yanpeng; Yuan, Li; Yang, Ming; Zheng, Yi; Li, Linjun; Gao, Libo; Nerngchamnong, Nisachol; Nai, Chang Tai; Sangeeth, C. S. Suchand; Feng, Yuan Ping; Nijhuis, Christian A.; Loh, Kian Ping

    2014-11-01

    Layer-by-layer-stacked chemical vapour deposition (CVD) graphene films find applications as transparent and conductive electrodes in solar cells, organic light-emitting diodes and touch panels. Common to lamellar-type systems with anisotropic electron delocalization, the plane-to-plane (vertical) conductivity in such systems is several orders lower than its in-plane conductivity. The poor electronic coupling between the planes is due to the presence of transfer process organic residues and trapped air pocket in wrinkles. Here we show the plane-to-plane tunnelling conductivity of stacked CVD graphene layers can be improved significantly by inserting 1-pyrenebutyric acid N-hydroxysuccinimide ester between the graphene layers. The six orders of magnitude increase in plane-to-plane conductivity is due to hole doping, orbital hybridization, planarization and the exclusion of polymer residues. Our results highlight the importance of interfacial modification for enhancing the performance of LBL-stacked CVD graphene films, which should be applicable to other types of stacked two-dimensional films.

  10. Optical and mechanical properties of diamond like carbon films deposited by microwave ECR plasma CVD

    Indian Academy of Sciences (India)

    S B Singh; M Pandey; N Chand; A Biswas; D Bhattacharya; S Dash; A K Tyagi; R M Dey; S K Kulkarni; D S Patil

    2008-10-01

    Diamond like carbon (DLC) films were deposited on Si (111) substrates by microwave electron cyclotron resonance (ECR) plasma chemical vapour deposition (CVD) process using plasma of argon and methane gases. During deposition, a d.c. self-bias was applied to the substrates by application of 13.56 MHz rf power. DLC films deposited at three different bias voltages (–60 V, –100 V and –150 V) were characterized by FTIR, Raman spectroscopy and spectroscopic ellipsometry to study the variation in the bonding and optical properties of the deposited coatings with process parameters. The mechanical properties such as hardness and elastic modulus were measured by load depth sensing indentation technique. The DLC film deposited at –100 V bias exhibit high hardness (∼ 19 GPa), high elastic modulus (∼ 160 GPa) and high refractive index (∼ 2.16–2.26) as compared to films deposited at –60 V and –150 V substrate bias. This study clearly shows the significance of substrate bias in controlling the optical and mechanical properties of DLC films.

  11. Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD

    Energy Technology Data Exchange (ETDEWEB)

    Uchida, Giichiro; Yamamoto, Kosuke; Kawashima, Yuki; Sato, Muneharu; Nakahara, Kenta; Itagaki, Naho; Koga, Kazunori; Shiratani, Masaharu [Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka (Japan); Kamataki, Kunihiro [Center for Reserch and Advancement in Higher Education, Kyushu University, Fukuoka (Japan); Kondo, Michio [National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki (Japan)

    2011-10-15

    We present production of silicon nano-particles and their surface nitridation for efficient multiple-exciton generation. Nitridated silicon nano-particles were produced using double multi-hollow discharge plasma CVD, where generation of silicon particles and their nitridation were independently performed using SiH{sub 4}/H{sub 2} and N{sub 2} multi-hollow discharge plasmas. We succeeded in controlling nitrogen content in a silicon nano-particle by varying a number density of N radicals irradiated to the Si particle. We also observed strong photoluminescence (PL) emission around 300-500 nm from silicon nano-particles, where the PL peak energy is about 2.5 and 3.1 eV for pure Si nano-particles, and 2.5, 3.1, and 4.1 eV for nitridated Si nano-particles. The additional UV-peak of 4.1 eV from nitridated Si particles is closely related to the nitridation surface layer on Si nano-particles (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  12. Room Temperature Growth of Hydrogenated Amorphous Silicon Films by Dielectric Barrier Discharge Enhanced CVD

    Institute of Scientific and Technical Information of China (English)

    GUO Yu; ZHANG Xiwen; HAN Gaorong

    2007-01-01

    Hydrogenated amorphous silicon (a-Si:H) films were deposited on Si (100) and glass substrates by dielectric barrier discharge enhanced chemical vapour deposition (DBD-CVD)in (SiH4+H2) atmosphere at room temperature.Results of the thickness measurement,SEM (scanning electron microscope),Raman,and FTIR (Fourier transform infrared spectroscopy) show that with the increase in the applied peak voltage,the deposition rate and network order of the films increase,and the hydrogen bonding configurations mainly in di-hydrogen (Si-H2) and poly hydrogen (SiH2)n are introduced into the films.The UV-visible transmission spectra show that with the decrease in Sill4/ (SiH4+H2) the thin films'band gap shifts from 1.92 eV to 2.17 eV.These experimental results are in agreement with the theoretic analysis of the DBD discharge.The deposition of a-Si:H films by the DBD-CVD method as reported here for the first time is attractive because it allows fast deposition of a-Si:H films on large-area low-melting-point substrates and requires only a low cost of production without additional heating or pumping equipment.

  13. A New Approach to Plasma CVD of TiO2 Photocatalyst on γ-Al2O3 Pellet Filled in Dielectric Barrier Discharges at Atmospheric Pressure

    Science.gov (United States)

    Zhu, Aimin; Nie, Longhui; Zhang, Xiuling; Shi, Chuan; Song, Zhimin; Xu, Yong

    2004-12-01

    A supported TiO2/γ-Al2O3 photocatalyst has been prepared by γ-Al2O3 pellet-filled dielectric barrier discharges induced plasma CVD at atmospheric pressure and room temperature. The TiO2/γ-Al2O3 photocatalyst exhibits higher photocatalytic activity than Degussa P25, and much higher photocatalytic activity than that prepared by thermal CVD.

  14. A New Approach to Plasma CVD of TiO2 Photocatalyst on γ-Al2O3 Pellet Filled in Dielectric Barrier Discharges at Atmospheric Pressure

    Institute of Scientific and Technical Information of China (English)

    朱爱民; 聂龙辉; 张秀玲; 石川; 宋志民; 徐勇

    2004-01-01

    A supported TiO2/γ-Al2O3 photocatalyst has been prepared by γ-Al2O3 pellet-filled dielectric barrier discharges induced plasma CVD at atmospheric pressure and room temperature.The TiO2/γ-Al2O3 photocatalyst exhibits higher photocatalytic activity than Degussa P25, and much higher photocatalytic activity than that prepared by thermal CVD.

  15. Influence of bowl shaped substrate holder on growth of polymeric DLC film in a microwave plasma CVD reactor

    Indian Academy of Sciences (India)

    Sambita Sahoo; S K Pradhan; Venkateswarlu Bhavanasi; Swati S Pradhan; S N Sarangi; P K Barhai

    2012-12-01

    The properties of diamond like carbon (DLC) films grown in modified microwave plasma CVD reactor is presented in this paper. By using bowl shaped steel substrate holder in a MW plasma CVD reactor (without ECR), films have been grown at relatively high pressure (20Torr) and at low temperature (without heating). The input microwave power was about 300W. Earlier, under the same growth conditions, no deposition was achieved when flat molybdenum/steel substrate holders were used. In this study, two different designs of bowl shaped steel substrate holder at different bias have been experimented. Raman spectra confirm the DLC characteristics of the films. FTIR results indicate that the carbon is bonded in the 3 form with hydrogen, and this characteristic is more pronounced when smaller holder is used. UV-visible spectra show high visible transmittance (∼85%) for films grown in both the holders. The nanoindentation hardness of the films have a wide range, about 4–16GPa. Field emission scanning electron microscope (FESEM) images reveal that the films have featureless and smooth surface morphology. These films are polymeric in nature with moderately high hardness, which may be useful as anti-scratch and anti-corrosive coatings.

  16. The Role of Plasma in Plasma Enhanced Chemical Vapour Deposition of Nanostructure Growth

    Science.gov (United States)

    Hash, David B.; Meyyappan, M.; Teo, Kenneth B. K.; Lacerda, Rodrigo G.; Rupesinghe, Nalin L.

    2004-01-01

    Chemical vapour deposition (CVD) has become the preferred process for high yield growth of carbon nanotubes and nanofibres because of its ability to pattern growth through lithographic positioning of transition metal catalysts on substrates. Many potential applications of nanotubes such as field emitters [1] require not only patterned growth but also vertical alignment. Some degree of ali,ment in thermal CVD processes can be obtained when carbon nanotubes are grown closely together as a result of van der Waals interactions. The ali,onment however is marginal, and the van der Waals prerequisite makes growth of freestanding nanofibres with thermal CVD unrealizable. The application of electric fields as a means of ali,onment has been shown to overcome this limitation [2-5], and highly aligned nanostructures can be grown if electric fields on the order of 0.5 V/microns are employed. Plasma enhanced CVD in various configurations including dc, rf, microwave, inductive and electron cyclotron resonance has been pursued as a means of enabling alignment in the CVD process. However, the sheath fields for the non-dc sources are in general not sufficient for a high degree of ali,pment and an additional dc bias is usually applied to the growth substrate. This begs the question as to the actual role of the plasma. It is clear that the plasma itself is not required for aligned growth as references [3] and [4] employed fields through small applied voltages (3-20 V) across very small electrode spacings (10-100 microns) and thus avoided striking a discharge.

  17. Enhanced incoherent scatter plasma lines

    Directory of Open Access Journals (Sweden)

    H. Nilsson

    Full Text Available Detailed model calculations of auroral secondary and photoelectron distributions for varying conditions have been used to calculate the theoretical enhancement of incoherent scatter plasma lines. These calculations are compared with EISCAT UHF radar measurements of enhanced plasma lines from both the E and F regions, and published EISCAT VHF radar measurements. The agreement between the calculated and observed plasma line enhancements is good. The enhancement from the superthermal distribution can explain even the very strong enhancements observed in the auroral E region during aurora, as previously shown by Kirkwood et al. The model calculations are used to predict the range of conditions when enhanced plasma lines will be seen with the existing high-latitude incoherent scatter radars, including the new EISCAT Svalbard radar. It is found that the detailed structure, i.e. the gradients in the suprathermal distribution, are most important for the plasma line enhancement. The level of superthermal flux affects the enhancement only in the region of low phase energy where the number of thermal electrons is comparable to the number of suprathermal electrons and in the region of high phase energy where the suprathermal fluxes fall to such low levels that their effect becomes small compared to the collision term. To facilitate the use of the predictions for the different radars, the expected signal- to-noise ratios (SNRs for typical plasma line enhancements have been calculated. It is found that the high-frequency radars (Søndre Strømfjord, EISCAT UHF should observe the highest SNR, but only for rather high plasma frequencies. The VHF radars (EISCAT VHF and Svalbard will detect enhanced plasma lines over a wider range of frequencies, but with lower SNR.

  18. Enhanced cold wall CVD reactor growth of horizontally aligned single-walled carbon nanotubes

    Science.gov (United States)

    Mu, Wei; Kwak, Eun-Hye; Chen, Bingan; Huang, Shirong; Edwards, Michael; Fu, Yifeng; Jeppson, Kjell; Teo, Kenneth; Jeong, Goo-Hwan; Liu, Johan

    2016-05-01

    HASynthesis of horizontally-aligned single-walled carbon nanotubes (HA-SWCNTs) by chemical vapor deposition (CVD) directly on quartz seems very promising for the fabrication of future nanoelectronic devices. In comparison to hot-wall CVD, synthesis of HA-SWCNTs in a cold-wall CVD chamber not only means shorter heating, cooling and growth periods, but also prevents contamination of the chamber. However, since most synthesis of HA-SWCNTs is performed in hot-wall reactors, adapting this well-established process to a cold-wall chamber becomes extremely crucial. Here, in order to transfer the CVD growth technology from a hot-wall to a cold-wall chamber, a systematic investigation has been conducted to determine the influence of process parameters on the HA-SWCNT's growth. For two reasons, the cold-wall CVD chamber was upgraded with a top heater to complement the bottom substrate heater; the first reason to maintain a more uniform temperature profile during HA-SWCNTs growth, and the second reason to preheat the precursor gas flow before projecting it onto the catalyst. Our results show that the addition of a top heater had a significant effect on the synthesis. Characterization of the CNTs shows that the average density of HA-SWCNTs is around 1 - 2 tubes/ μm with high growth quality as shown by Raman analysis. [Figure not available: see fulltext.

  19. Control of Reaction Surface in Low Temperature CVD to Enhance Nucleation and Conformal Coverage

    Science.gov (United States)

    Kumar, Navneet

    2009-01-01

    The Holy Grail in CVD community is to find precursors that can afford the following: good nucleation on a desired substrate and conformal deposition in high AR features. Good nucleation is not only necessary for getting ultra-thin films at low thicknesses; it also offers films that are smooth at higher thickness values. On the other hand,…

  20. Structural and optical characterization of thick and thin polycrystalline diamond films deposited by microwave plasma activated CVD

    Indian Academy of Sciences (India)

    S K Pradhan; B Satpati; B P Bag; T Sharda

    2012-02-01

    Preliminary results of growth of thin diamond film in a recently installed 3 kW capacity microwave plasma activated CVD (MW-PACVD) system are being reported. The films were deposited on Si (100) substrate at 850°C using methane and hydrogen mixture at 1.5 kW MW power. The grown polycrystalline films were characterized by micro-Raman, transmission electron microscope (TEM), spectrophotometer and atomic force microscope (AFM). The results were compared with that of a thicker diamond film grown elsewhere in a same make MWPACVD system at relatively higher power densities. The presence of a sharp Raman peak at 1332 cm-1 confirmed the growth of diamond, and transmission spectra showed typical diamond film characteristics in both the samples. Typical twin bands and also a quintuplet twinned crystal were observed in TEM, further it was found that the twinned region in thin sample composed of very fine platelet like structure.

  1. Optical spectroscopic analyses of CVD plasmas used in the deposition of transparent and conductive ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Martin, A.; Espinos, J.P.; Yubero, F.; Barranco, A.; Gonzalez-Elipe, A.R. [Instituto de Ciencias de Materiales de Sevilla, CSIC-Universidad de Sevilla (Spain); Cotrino, J. [Universidad de Sevilla, Facultad de Fisica, Dept. de Fisica Atomica, Molecular y Nuclear, Sevilla (Spain)

    2001-07-01

    Transparent conducting ZnO:A1 thin films have been prepared by remote plasma enhanced chemical vapor deposition. Emission line profiles were recorded as a function of different plasma gas composition (oxygen and hydrogen mixtures) and different rates of precursors (Zn(C{sub 2}H{sub 5}){sub 2} and A1(CH{sub 3}){sub 3}) in the downstream zone of the plasma reactor. Optical emission spectroscopy were used to characterize the oxygen/hydrogen plasma as a function of hydrogen flow rate. The variation of plasma hydrogen content has an important influence in the resistivity of the films. (authors)

  2. Review: Plasma-enhanced chemical vapor deposition of nanocrystalline diamond

    Directory of Open Access Journals (Sweden)

    Katsuyuki Okada

    2007-01-01

    Full Text Available Nanocrystalline diamond films have attracted considerable attention because they have a low coefficient of friction and a low electron emission threshold voltage. In this paper, the author reviews the plasma-enhanced chemical vapor deposition (PE-CVD of nanocrystalline diamond and mainly focuses on the growth of nanocrystalline diamond by low-pressure PE-CVD. Nanocrystalline diamond particles of 200–700 nm diameter have been prepared in a 13.56 MHz low-pressure inductively coupled CH4/CO/H2 plasma. The bonding state of carbon atoms was investigated by ultraviolet-excited Raman spectroscopy. Electron energy loss spectroscopy identified sp2-bonded carbons around the 20–50 nm subgrains of nanocrystalline diamond particles. Plasma diagnostics using a Langmuir probe and the comparison with plasma simulation are also reviewed. The electron energy distribution functions are discussed by considering different inelastic interaction channels between electrons and heavy particles in a molecular CH4/H2 plasma.

  3. Interlayer utilization (including metal borides) for subsequent deposition of NSD films via microwave plasma CVD on 316 and 440C stainless steels

    Science.gov (United States)

    Ballinger, Jared

    . Surface boriding was implemented using the novel method of microwave plasma CVD with a mixture of hydrogen and diborane gases. On 440C bearings, dual phase boride layers of Fe2B and FeB were formed which supported adhered nanostructured diamond films. Continuity of the films was not seamless with limited regions remaining uncoated potentially corresponding to delamination of the film as evidenced by the presence of tubular structures presumably composed of sp2 bonded carbon. Surface boriding of 316 stainless steel discs was conducted at various powers and pressures to achieve temperatures ranging from 550-800 °C. The substrate boriding temperature was found to substantially influence the resultant interlayer by altering the metal boride(s) present. The lowest temperatures produced an interlayer where CrB was the single detected phase, higher temperatures yielded the presence of only Fe2B, and a combination of the two phases resulted from an intermediate boriding temperature. Compared with the more common, commercialized boriding methods, this a profound result given the problems posed by the FeB phase in addition to other advantages offered by CVD processes and microwave generated plasmas in general. Indentation testing of the boride layers revealed excellent adhesion strength for all borided interlayers, and above all, no evidence of cracking was observed for a sole Fe2B phase. As with boriding of 440C bearings, subsequent diamond deposition was achieved on these interlayers with substantially improved adhesion strength relative to diamond coated TiN interlayers. Both XRD and Raman spectroscopy confirmed a nanostructured diamond film with interfacial chromium carbides responsible for enhanced adhesion strength. Interlayers consisting solely of Fe2B have displayed an ability to support fully continuous nanostructured diamond films, yet additional study is required for consistent reproduction. This is in good agreement with initial work on pack borided high alloy steels

  4. Development of atmospheric pressure CVD processes for highquality transparent conductive oxides

    NARCIS (Netherlands)

    Graaf, A. de; Deelen, J. van; Poodt, P.W.G.; Mol, A.M.B. van; Spee, C.I.M.A.; Grob, F.; Kuypers, A.

    2010-01-01

    For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. It is shown that by combining precursor development, fundam

  5. Atmospheric pressure plasma CVD as a tool to functionalise wound dressings.

    Science.gov (United States)

    Spange, Sebastian; Pfuch, Andreas; Wiegand, Cornelia; Beier, Oliver; Hipler, Uta C; Grünler, Bernd

    2015-02-01

    The main goal of this investigation was the preparation of an antibacterial layer system for additional modification of wound dressings with atmospheric plasma. Furthermore, the modified wound dressings were checked on there bactericidal and cytotoxic activity. The layer system was applied by using a novel atmospheric pressure plasma chemical vapour deposition technique on a variety of textile substrates which are suitable as wound dressing materials. The layer system composed of silicon dioxide with in situ generated embedded silver nanoparticles. The bactericidal activity of the produced wound dressings was investigated against different bacteria like Staphylococcus aureus and Klebsiella pneumoniae while the cytotoxic potential of the coated wound dressings was verified using human keratinocytes. Even at low concentrations of silver precursor a strong antibacterial effect was observed in direct contact with S. aureus and K. pneumoniae. Furthermore, extractions produced from the coated textiles showed a good antibacterial effect. By means of optimised coating parameters a therapeutic window for those wound dressings could be identified. Consequently, the atmospheric pressure plasma chemical vapour deposition technique promise an effective and low cost modification of wound dressing materials.

  6. Novel Diamond Films Synthesis Strategy: Methanol and Argon Atmosphere by Microwave Plasma CVD Method Without Hydrogen

    Science.gov (United States)

    Yang, Li; Jiang, Caiyi; Guo, Shenghui; Zhang, Libo; Gao, Jiyun; Peng, Jinhui; Hu, Tu; Wang, Liang

    2016-09-01

    Diamond thin films are grown on silicon substrates by only using methanol and argon mixtures in microwave plasma chemical vapor deposition (MPCVD) reactor. It is worth mentioning that the novel strategy makes the synthesis reaction works smoothly without hydrogen atmosphere, and the substrates temperature is only 500 °C. The evidence of surface morphology and thickness under different time is obtained by characterizing the samples using scanning electron microscopy (SEM). X-ray diffractometer (XRD) spectrum reveals that the preferential orientation of (111) plane sample is obtained. The Raman spectra indicate that the dominant component of all the samples is a diamond. Moreover, the diamond phase content of the targeted films was quantitatively analyzed by X-ray photoelectron spectroscopy (XPS) method, and the surface roughness of diamond films was investigated by atomic force microscope (AFM). Meanwhile, the possible synthesis mechanism of the diamond films in methanol- and argon-mixed atmosphere was discussed.

  7. THERMODYNAMIC ANALYSIS AND EXPERIMENTAL VERIFICATION FOR SYNTHESIZING SILICON NITRIDE NANOPARTICLES USING RF PLASMA CVD

    Institute of Scientific and Technical Information of China (English)

    Ruoyu Hong; Jianmin Ding; Hongzhong Li

    2003-01-01

    Silicon nitride nanoparticles were synthesized by radio-frequency (RF) plasma chemical vapor deposition (PCVD) using silicon tetrachloride and ammonia as precursors, and argon as carrier gas. By assuming chemical thermodynamic equilibrium in the system, a computer program based on chemical thermodynamics was used to calculate the compositions of the system at different initial concentrations and final temperatures. At first, five elements and thirty-four species were considered. The effects of temperatures, and concentrations of ammonia, hydrogen and nitrogen on the equilibrium compositions were analyzed. It was found that the optimal reaction temperature range should be 1200 to 1500 K to obtain the highest conversion and yield of Si3N4. The inlet position of ammonia should be lower than that of silicon tetrachloride, and both should be located at the tail of the plasma torch. The best mole ratio of ammonia to silicon tetrachloride was found to be about 6. Later, the influences of water (and oxygen) were considered, and 17 additional species were included in the computations. It was found that oxygen or water content in the raw materials should be as low as possible in order to have high nitride content in the produced Si3N4. Nitrogen or hydrogen might be used to replace some or even all the argon to improve the yield of silicon nitride and reduce the cost. The ratio of ammonia to silicon tetrachloride should be high enough to obtain high conversion, but not excessively high to reduce the oxygen content due to the existence of water in ammonia. The simulated results were verified by experiments.

  8. Characterizations of microwave plasma CVD grown polycrystalline diamond coatings for advanced technological applications

    Directory of Open Access Journals (Sweden)

    Awadesh Kumar Mallik

    2014-06-01

    Full Text Available Polycrystalline diamond (PCD coatings ranging from few microns to several hundred microns thickness have been grown by 915 MHz microwave plasma reactor with 9000 W power. The coatings were deposited on 100 mm diameter silicon (Si substrate from few hours to several days of continuous runs. PCD coatings were made freestanding by wet chemical etching technique. The deposited PCDs were evaluated by X-ray diffraction (XRD, scanning electron microscopy (SEM, Raman spectroscopy, X-ray photoelectron spectroscopy (XPS for physical characterization and compared with authors’ earlier work. Refractive index of 2.41 was obtained at 633 nm wavelength and a maximum of 6.6 W·cm-1K-1 value for thermal conductivity could be achieved with the grown coatings. The values are well above the existing non-diamond heat spreading substrates, which makes the grown PCDs as candidates for heat spreaders in different technological applications. High refractive index along with translucent nature of the white freestanding PCDs, make them potential candidate for optical windows.

  9. Electrochemical Properties of Boron-Doped Diamond Electrodes Prepared by Hot Cathode Direct Current Plasma CVD

    Directory of Open Access Journals (Sweden)

    Hong Yan PENG

    2016-05-01

    Full Text Available A series of boron-doped diamond (BDD films were deposited by using a hot cathode direct current plasma chemical vapor deposition(HCDC-PCVD system with different ratios of CH4/H2/B(OCH33 (trimethylborate gas mixture. The morphology, structure and quality of BDD films were controled by SEM, XRD and Raman measurements. The electrochemical properties of the BDD films were investigated by electrochemical methods. Cyclic voltammetric performances of the BDD films indicated that the main determinant in the electrochemical characteristics of BDD films was the boron doping amount. The threshold potential for oxygen evolution increased from 1 V to 2.5 V. Meanwhile, the electrochemical potential window of BDD films was enlarged from 2.2 V to 4.5 V when the B content was increased from 1.75 × 1019cm-3 to 2.4 × 1021 cm−3. The cyclic voltammograms of BDD films in K4Fe(CN6 and K3Fe(CN6 mixed solution indicated that the behavior of Fe(CN6-3/-4 redox couple could be regarded as semi-reversible.DOI: http://dx.doi.org/10.5755/j01.ms.22.2.12926

  10. The Formation of Nanocrystalline Diamond Coating on WC Deposited by Microwave Assisted Plasma CVD

    Science.gov (United States)

    Toff, M. R. M.; Hamzah, E.; Purniawan, A.

    2010-03-01

    Diamond is one form of carbon structure. The extreme hardness and high chemical resistant of diamond coatings determined that many works on this area relate to coated materials for tribological applications in biomedicine, as mechanical seals or cutting tools for hard machining operations. In the work, nanocrystalline diamond (NCD) coated tungsten carbide (WC) have been deposited by microwave assisted plasma chemical vapor deposition (MAPCVD) from CH4/H2 mixtures. Morphology of NCD was investigated by using Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM). The quality of NCD is defined as ratio between diamond and non diamond and also full width at half maximum (FWHM) was determined using Raman spectra. The result found that the NCD structure can be deposited on WC surface using CH4/H2 gas mixture with grain size ˜20 nm to 100 nm. Increase %CH4 concentration due to increase the nucleation of NCD whereas decrease the quality of diamond. Based on Raman spectra, the quality of NCD is in the range ˜98.82-99.01% and 99.56-99.75% for NCD and microcrystalline (MCD), respectively. In addition, FWHM of NCD is high than MCD in the range of 8.664-62.24 cm-1 and 4.24-5.05 cm-1 for NCD and MCD respectively that indicate the crystallineity of NCD is smaller than MCD.

  11. Plasma Enhanced Growth of Carbon Nanotubes For Ultrasensitive Biosensors

    Science.gov (United States)

    Cassell, Alan M.; Li, J.; Ye, Q.; Koehne, J.; Chen, H.; Meyyappan, M.

    2004-01-01

    The multitude of considerations facing nanostructure growth and integration lends itself to combinatorial optimization approaches. Rapid optimization becomes even more important with wafer-scale growth and integration processes. Here we discuss methodology for developing plasma enhanced CVD growth techniques for achieving individual, vertically aligned carbon nanostructures that show excellent properties as ultrasensitive electrodes for nucleic acid detection. We utilize high throughput strategies for optimizing the upstream and downstream processing and integration of carbon nanotube electrodes as functional elements in various device types. An overview of ultrasensitive carbon nanotube based sensor arrays for electrochemical biosensing applications and the high throughput methodology utilized to combine novel electrode technology with conventional MEMS processing will be presented.

  12. Plasma Enhanced Growth of Carbon Nanotubes For Ultrasensitive Biosensors

    Science.gov (United States)

    Cassell, Alan M.; Li, J.; Ye, Q.; Koehne, J.; Chen, H.; Meyyappan, M.

    2004-01-01

    The multitude of considerations facing nanostructure growth and integration lends itself to combinatorial optimization approaches. Rapid optimization becomes even more important with wafer-scale growth and integration processes. Here we discuss methodology for developing plasma enhanced CVD growth techniques for achieving individual, vertically aligned carbon nanostructures that show excellent properties as ultrasensitive electrodes for nucleic acid detection. We utilize high throughput strategies for optimizing the upstream and downstream processing and integration of carbon nanotube electrodes as functional elements in various device types. An overview of ultrasensitive carbon nanotube based sensor arrays for electrochemical biosensing applications and the high throughput methodology utilized to combine novel electrode technology with conventional MEMS processing will be presented.

  13. Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayers

    Science.gov (United States)

    Majee, Subimal; Fátima Cerqueira, Maria; Tondelier, Denis; Geffroy, Bernard; Bonnassieux, Yvan; Alpuim, Pedro; Bourée, Jean Eric

    2014-01-01

    The reliability and stability are key issues for the commercial utilization of organic photovoltaic devices based on flexible polymer substrates. To increase the shelf-lifetime of these devices, transparent moisture barriers of silicon nitride (SiNx) films are deposited at low temperature by hot wire CVD (HW-CVD) process. Instead of the conventional route based on organic/inorganic hybrid structures, this work defines a new route consisting in depositing multilayer stacks of SiNx thin films, each single layer being treated by argon plasma. The plasma treatment allows creating smoother surface and surface atom rearrangement. We define a critical thickness of the single layer film and focus our attention on the effect of increasing the number of SiNx single-layers on the barrier properties. A water vapor transmission rate (WVTR) of 2 × 10-4 g/(m2·day) is reported for SiNx multilayer stack and a physical interpretation of the plasma treatment effect is given.

  14. Stable dropwise condensation for enhancing heat transfer via the initiated chemical vapor deposition (iCVD) of grafted polymer films.

    Science.gov (United States)

    Paxson, Adam T; Yagüe, Jose L; Gleason, Karen K; Varanasi, Kripa K

    2014-01-22

    Ultra-thin copolymer films are deposited by initiated chemical deposition (iCVD) to investigate their performance under the condensation of water vapor. By forming a grafted interface between the coating and the substrate, the films exhibit stable dropwise condensation even when subjected to 100 °C steam. The applicability of the iCVD to complex substrate geometries is demonstrated on a copper condenser coil.

  15. Enhanced graphitization of c-CVD grown multi-wall carbon nanotube arrays assisted by removal of encapsulated iron-based phases under thermal treatment in argon

    Energy Technology Data Exchange (ETDEWEB)

    Boncel, Slawomir, E-mail: slawomir.boncel@polsl.pl [Department of Organic Chemistry, Biochemistry and Biotechnology, Silesian University of Technology, Krzywoustego 4, 44-100 Gliwice (Poland); Koziol, Krzysztof K.K., E-mail: kk292@cam.ac.uk [Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, CB3 0FS Cambridge (United Kingdom)

    2014-05-01

    Graphical abstract: - Highlights: • Annealing of the c-CVD MWCNT arrays toward complete removal of iron nanoparticles. • The ICP-AES protocol established for quantitative analysis of Fe-content in MWCNTs. • The vertical alignment from the as-grown MWCNT arrays found intact after annealing. • A route to decrease number of defects/imperfections in the MWCNT graphene walls. • A foundation for commercial purification of c-CVD derived MWCNTs. - Abstract: The effect of annealing on multi-walled carbon nanotube (MWCNT) arrays grown via catalytic Chemical Vapour Deposition (c-CVD) was studied. The treatment enabled to decrease number of defects/imperfections in the graphene walls of MWCNTs’, which was reflected in Raman spectroscopy by reduction of the I{sub D}/I{sub G} ratio by 27%. Moreover, the vertical alignment from the as-synthesized nanotube arrays was found intact after annealing. Not only graphitization of the nanotube walls occurred under annealing, but the amount of metal iron-based catalyst residues (interfering with numerous physicochemical properties, and hence applications of MWCNTs) was reduced from 9.00 wt.% (for pristine MWCNTs) to 0.02 wt.% as detected by Inductively Coupled Plasma Atomic Emission Spectroscopy (ICP-AES). This value, established by a new analytical protocol, is the lowest recorded by now for purified c-CVD MWCNTs and, due to operating under atmospheric pressure, medium temperature regime (as for annealing processes), reasonable time-scale and metal residue non-specificity, it could lay the foundation for commercial purification of c-CVD derived MWCNTs.

  16. Direct growth of doping-density-controlled hexagonal graphene on SiO2 substrate by rapid-heating plasma CVD.

    Science.gov (United States)

    Kato, Toshiaki; Hatakeyama, Rikizo

    2012-10-23

    A transfer-free method for growing carrier-density-controlled graphene directly on a SiO(2) substrate has been realized for the first time by rapid-heating plasma chemical vapor deposition (RH-PCVD). Using this method, high-quality single-layer graphene sheets with a hexagonal domain can be selectively grown between a Ni film and a SiO(2) substrate. Systematic investigations reveal that the relatively thin Ni layer, rapid heating, and plasma CVD are critical to the success of this unique method of graphene growth. By applying this technique, an easy and scalable graphene-based field effect transistor (FET) fabrication is also demonstrated. The electrical transport type of the graphene-based FET can be precisely tuned by adjusting the NH(3) gas concentration during the RH-PCVD process.

  17. Diagnosis of gas phase near the substrate surface in diamond film deposition by high-power DC arc plasma jet CVD

    Institute of Scientific and Technical Information of China (English)

    Zuyuan Zhou; Guangchao Chen; Bin Li; Weizhong Tang; Fanxiu Lv

    2007-01-01

    Optical emission spectroscopy (OES) was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition (CVD). C2 radical was determined as the main carbon radical in this plasma atmosphere. The deposition parameters, such as substrate temperature, anode-substrate distance, methane concentration, and gas flow rate, were inspected to find out the influence on the gas phase. A strong dependence of the concentrations and distribution of radicals on substrate temperature was confirmed by the design of experiments (DOE). An explanation for this dependence could be that radicals near the substrate surface may have additional ionization or dissociation and also have recombination,or are consumed on the substrate surface where chemical reactions occur.

  18. Atmospheric Pressure Plasma CVD of Amorphous Hydrogenated Silicon Carbonitride (a-SiCN:H) Films Using Triethylsilane and Nitrogen

    Energy Technology Data Exchange (ETDEWEB)

    Srinivasan Guruvenket; Steven Andrie; Mark Simon; Kyle W. Johnson; Robert A. Sailer

    2011-10-04

    Amorphous hydrogenated silicon carbonitride (a-SiCN:H) thin films are synthesized by atmospheric pressure plasma enhanced chemical vapor (AP-PECVD) deposition using the Surfx Atomflow{trademark} 250D APPJ source with triethylsilane (HSiEt{sub 3}, TES) and nitrogen as the precursor and the reactive gases, respectively. The effect of the substrate temperature (T{sub s}) on the growth characteristics and the properties of a-SiCN:H films was evaluated. The properties of the films were investigated via scanning electron microscopy (SEM), atomic force microscopy (AFM) for surface morphological analyses, Fourier transform infrared spectroscopy (FTIR), and X-ray photoelectron spectroscopy (XPS) for chemical and compositional analyses; spectroscopic ellipsometry for optical properties and thickness determination and nanoindentation to determine the mechanical properties of the a-SiCN:H films. Films deposited at low T{sub s} depict organic like features, while the films deposited at high T{sub s} depict ceramic like features. FTIR and XPS studies reveal that an increases in T{sub s} helps in the elimination of organic moieties and incorporation of nitrogen in the film. Films deposited at T{sub s} of 425 C have an index of refraction (n) of 1.84 and hardness (H) of 14.8 GPa. A decrease in the deposition rate between T{sub s} of 25 and 250 C and increase in deposition rate between T{sub s} of 250 and 425 C indicate that the growth of a-SiCN:H films at lower T{sub s} are surface reaction controlled, while at high temperatures film growth is mass-transport controlled. Based on the experimental results, a potential route for film growth is proposed.

  19. Diets high in resistant starch increase plasma levels of trimethylamine-N-oxide, a gut microbiome metabolite associated with CVD risk

    Energy Technology Data Exchange (ETDEWEB)

    Bergeron, Nathalie; Williams, Paul T.; Lamendella, Regina; Faghihnia, Nastaran; Grube, Alyssa; Li, Xinmin; Wang, Zeneng; Knight, Rob; Jansson, Janet K.; Hazen, Stanley L.; Krauss, Ronald M.

    2016-12-20

    Production of trimethylamine-N-oxide (TMAO), a biomarker of CVD risk, is dependent on intestinal microbiota, but little is known of dietary conditions promoting changes in gut microbial communities. Resistant starches (RS) alter the human microbiota. We sought to determine whether diets varying in RS and carbohydrate (CHO) content affect plasma TMAO levels. We also assessed postprandial glucose and insulin responses and plasma lipid changes to diets high and low in RS. In a cross-over trial, fifty-two men and women consumed a 2-week baseline diet (41 percentage of energy (%E) CHO, 40 % fat, 19 % protein), followed by 2-week high- and low-RS diets separated by 2-week washouts. RS diets were assigned at random within the context of higher (51–53 %E)v. lower CHO (39–40 %E) intake. Measurements were obtained in the fasting state and, for glucose and insulin, during a meal test matching the composition of the assigned diet. With lower CHO intake, plasma TMAO, carnitine, betaine andγ-butyrobetaine concentrations were higher after the high-v. low-RS diet (P<0·01 each). These metabolites were not differentially affected by highv. low RS when CHO intake was high. Although the high-RS meal reduced postprandial insulin and glucose responses when CHO intake was low (P<0·01 each), RS did not affect fasting lipids, lipoproteins, glucose or insulin irrespective of dietary CHO content. In conclusion, a lower-CHO diet high in RS was associated with higher plasma TMAO levels. These findings, together with the absence of change in fasting lipids, suggest that short-term high-RS diets do not improve markers of cardiometabolic health.

  20. Surface chemistry of boron-doped SiO{sub 2} CVD: Enhanced uptake of tetraethyl orthosilicate by hydroxyl groups bonded to boron

    Energy Technology Data Exchange (ETDEWEB)

    Bartram, M.E.; Moffat, H.K.

    1993-12-31

    Insight into how dopants can enhance deposition rates has been obtained by comparing reactivities of tetraethyl orthosilicate (TEOS, Si(OCH{sub 2}CH{sub 3}){sub 4}) with silanol and boranol groups on SiO{sub 2}. This comparison is relevant for boron-doped SiO{sub 2} film growth from TEOS and trimethyl borate (TMB, B(OCH{sub 3}){sub 3}) sources since boranols and silanols are expected to be present on surface during the (CVD). A silica substrate having coadsorbed deuterated silanols (SIOD) and boranols (BOD) was reacted with TEOS in a cold-wall reactor in the mTorr pressure regime at 1000K. Reactions were followed with Fourier transform infrared spectroscopy. Use of deuterated hydroxyls allowed consumption of hydroxyls by TEOS chemisorption to be distinguished from concurrent formation of SIOH and BOH that results from TEOS decomposition. It was found that TEOS reacts with BOD at twice the rate observed for SIOD demonstrating that hydroxyl groups bonded to boron increase the rate of TEOS chemisorption. Surface ethoxy groups produced by chemisorption of TEOS decompose at a slower rate in the presence of TMB decomposition products. Possible dependencies on reactor geometries and other deposition conditions may determine which of these two competing effects will control deposition rates. This may explain (in part) why the rate enhancement effect is not always observed in boron-doped SiO{sub 2} CVD processes.

  1. Synthesis of crystalline Ge nanoclusters in PE-CVD-deposited SiO2 films

    DEFF Research Database (Denmark)

    Leervad Pedersen, T.P.; Skov Jensen, J.; Chevallier, J.

    2005-01-01

    The synthesis of evenly distributed Ge nanoclusters in plasma-enhanced chemical-vapour-deposited (PE-CVD) SiO2 thin films containing 8 at. % Ge is reported. This is of importance for the application of nanoclusters in semiconductor technology. The average diameter of the Ge nanoclusters can...

  2. Morphology of Diamond Layers Grown on Different Facets of Single Crystal Diamond Substrates by a Microwave Plasma CVD in CH4-H2-N2 Gas Mixtures

    Directory of Open Access Journals (Sweden)

    Evgeny E. Ashkinazi

    2017-06-01

    Full Text Available Epitaxial growth of diamond films on different facets of synthetic IIa-type single crystal (SC high-pressure high temperature (HPHT diamond substrate by a microwave plasma CVD in CH4-H2-N2 gas mixture with the high concentration (4% of nitrogen is studied. A beveled SC diamond embraced with low-index {100}, {110}, {111}, {211}, and {311} faces was used as the substrate. Only the {100} face is found to sustain homoepitaxial growth at the present experimental parameters, while nanocrystalline diamond (NCD films are produced on other planes. This observation is important for the choice of appropriate growth parameters, in particular, for the production of bi-layer or multilayer NCD-on-microcrystalline diamond (MCD superhard coatings on tools when the deposition of continuous conformal NCD film on all facet is required. The development of the film morphology with growth time is examined with SEM. The structure of hillocks, with or without polycrystalline aggregates, that appear on {100} face is analyzed, and the stress field (up to 0.4 GPa within the hillocks is evaluated based on high-resolution mapping of photoluminescence spectra of nitrogen-vacancy NV optical centers in the film.

  3. Deposition of low stress, high transmittance SiC as an x-ray mask membrane using ECR plasma CVD

    CERN Document Server

    Lee, S Y; Lim, S T; Ahn, J H

    1998-01-01

    SiC for x-ray mask membrane is deposited by Electron Cyclotron Resonance plasma Chemical Vapor Deposition from SiH sub 4 /CH sub 4 Ar mixtures. Stoichiometric SiC is deposited at SiH sub 4 /CH sub 4 ratio of 0.4, deposition temperature of 600.deg.C and microwave power of 500 W with +- 5% thickness uniformity, As-deposited film has compressive residual stress, very smooth surface (31 A rms) and high optical transmittance of 90% at 633 nm wavelength. The microstructure of this film consists of the nanocrystalline particle (100 A approx 200A) embedded in amorphous matrix. Residual stress can be turned to tensile stress via Rapid Thermal Annealing in N sub 2 atmosphere, while suppressing structural change during annealing, As a result, smooth (37 A rms) SiC film with moderate tensile stress and high optical transmittance (85% at 633 nm wavelength) is obtained.

  4. Direct synthesis and characterization of optically transparent conformal zinc oxide nanocrystalline thin films by rapid thermal plasma CVD.

    Science.gov (United States)

    Pedersen, Joachim D; Esposito, Heather J; Teh, Kwok Siong

    2011-10-31

    We report a rapid, self-catalyzed, solid precursor-based thermal plasma chemical vapor deposition process for depositing a conformal, nonporous, and optically transparent nanocrystalline ZnO thin film at 130 Torr (0.17 atm). Pure solid zinc is inductively heated and melted, followed by ionization by thermal induction argon/oxygen plasma to produce conformal, nonporous nanocrystalline ZnO films at a growth rate of up to 50 nm/min on amorphous and crystalline substrates including Si (100), fused quartz, glass, muscovite, c- and a-plane sapphire (Al2O3), gold, titanium, and polyimide. X-ray diffraction indicates the grains of as-deposited ZnO to be highly textured, with the fastest growth occurring along the c-axis. The individual grains are observed to be faceted by (103) planes which are the slowest growth planes. ZnO nanocrystalline films of nominal thicknesses of 200 nm are deposited at substrate temperatures of 330°C and 160°C on metal/ceramic substrates and polymer substrates, respectively. In addition, 20-nm- and 200-nm-thick films are also deposited on quartz substrates for optical characterization. At optical spectra above 375 nm, the measured optical transmittance of a 200-nm-thick ZnO film is greater than 80%, while that of a 20-nm-thick film is close to 100%. For a 200-nm-thick ZnO film with an average grain size of 100 nm, a four-point probe measurement shows electrical conductivity of up to 910 S/m. Annealing of 200-nm-thick ZnO films in 300 sccm pure argon at temperatures ranging from 750°C to 950°C (at homologous temperatures between 0.46 and 0.54) alters the textures and morphologies of the thin film. Based on scanning electron microscope images, higher annealing temperatures appear to restructure the ZnO nanocrystalline films to form nanorods of ZnO due to a combination of grain boundary diffusion and bulk diffusion.PACS: films and coatings, 81.15.-z; nanocrystalline materials, 81.07.Bc; II-VI semiconductors, 81.05.Dz.

  5. Effect of plasma CVD operating temperature on nanomechanical properties of TiC nanostructured coating investigated by atomic force microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Shanaghi, Ali, E-mail: alishanaghi@gmail.com [Materials Engineering Department, Faculty of Engineering, Malayer University, P.O. Box: 95863-65719, Malayer (Iran, Islamic Republic of); Rouhaghdam, Ali Reza Sabour, E-mail: sabour01@modares.ac.ir [Surface Engineering Laboratory, Materials Engineering Department, Faculty of Engineering, Tarbiat Modares University, P.O. Box: 14115-143, Tehran (Iran, Islamic Republic of); Ahangarani, Shahrokh, E-mail: sh.ahangarani@gmail.com [Advanced Materials and Renewable Energies Department, Iranian Research Organization for Science and Technology, P.O. Box 15815-3538, Tehran (Iran, Islamic Republic of); Chu, Paul K., E-mail: paul.chu@cityu.edu.hk [Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong (China)

    2012-09-15

    Highlights: ► The TiC{sub x} nanostructure coatings have been deposited by PACVD method. ► Dominant mechanism of growth structure at 490 °C is island-layer type. ► TiC{sub x} nanostructure coating applied at 490 °C, exhibits lowest friction coefficient. ► Young's moduli are 289.9, 400 and 187.6 GPa for 470, 490 and 510 °C, respectively. ► This higher elastic modulus and higher hardness of nanocoating obtain at 490 °C. -- Abstract: The structure, composition, and mechanical properties of nanostructured titanium carbide (TiC) coatings deposited on H{sub 11} hot-working tool steel by pulsed-DC plasma assisted chemical vapor deposition at three different temperatures are investigated. Nanoindentation and nanoscratch tests are carried out by atomic force microscopy to determine the mechanical properties such as hardness, elastic modulus, surface roughness, and friction coefficient. The nanostructured TiC coatings prepared at 490 °C exhibit lower friction coefficient (0.23) than the ones deposited at 470 and 510 °C. Increasing the deposition temperature reduces the Young's modulus and hardness. The overall superior mechanical properties such as higher hardness and lower friction coefficient render the coatings deposited at 490 °C suitable for wear resistant applications.

  6. Effects of duty cycle on microstructure and corrosion behavior of TiC coatings prepared by DC pulsed plasma CVD

    Energy Technology Data Exchange (ETDEWEB)

    Shanaghi, Ali, E-mail: alishanaghi@gmail.com [Surface Engineering Laboratory, Materials Engineering Department, Faculty of Engineering, Tarbiat Modares University, P.O. Box 14115-143, Tehran (Iran, Islamic Republic of); Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon (Hong Kong); Rouhaghdam, Ali Reza Sabour, E-mail: sabour01@modares.ac.ir [Surface Engineering Laboratory, Materials Engineering Department, Faculty of Engineering, Tarbiat Modares University, P.O. Box 14115-143, Tehran (Iran, Islamic Republic of); Ahangarani, Shahrokh, E-mail: sh.ahangarani@gmail.com [Advanced Materials and Renewable Energies Department, Iranian Research organization for science and technology, P.O. Box 15815-3538, Tehran (Iran, Islamic Republic of); Chu, Paul K., E-mail: paul.chu@cityu.edu.hk [Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon (Hong Kong); Farahani, Taghi Shahrabi, E-mail: tshahrabi34@modares.ac.ir [Surface Engineering Laboratory, Materials Engineering Department, Faculty of Engineering, Tarbiat Modares University, P.O. Box 14115-143, Tehran (Iran, Islamic Republic of)

    2012-01-15

    Titanium carbide coatings are deposited on hot-work steel (H{sub 11}) by plasma-assisted chemical vapor deposition (PACVD) and the dependence of the corrosion behavior on fabrication parameters is investigated. Grazing incidence X-ray diffraction (GIXRD), field emission scanning electron microscopy (FESEM), Raman and electrochemical tests are used to study the structure as well as corrosion behaviors. Grazing incidence X-ray diffraction reveals the (2 0 0) plane implying that the TiC coatings are deposited via the kinetics-limited crystal growth mechanism and under thermodynamically stable conditions. The SEM results indicate that the formation of a homogeneous and uniform titanium carbide nanostructure coatings. Potentiodynamic and electrochemical impedance tests performed in 0.5 M H{sub 2}SO{sub 4} and 0.05 M NaCl show that the TiC coating produced using a 40% duty cycle possesses high corrosion resistance in both media. The R{sub p} values of the TiC coating (50% duty cycle) in 0.05 M NaCl and the other TiC coating (40% duty cycle) in 0.5 M H{sub 2}SO{sub 4} are approximately four and sixteen orders of magnitude higher than that of the bare steel, respectively. Our results reveal that the duty cycles not only affect the structure and morphology of the coatings but also influence the electrochemical properties.

  7. Combustion Enhancement with a Silent Discharge Plasma

    Science.gov (United States)

    Rosocha, Louis

    2003-10-01

    It is well known that the application of an external electric field to a flame can affect its propagation speed, stability, and combustion chemistry (Lawton & Weinberg 1969). External electrodes, arc discharges, and plasma jets have been employed to allow combustible gas mixtures to operate outside their flammability limits by gas heating, injection of free radicals, and field-promoted flame stabilization (Yagodnikov & Voronetskii 1994). Other investigators have carried out experiments with silent electrical discharges applied to propagating flames (Inomata et al 1983, Kim et al 2003). These have demonstrated that the flame propagation velocity is actually decreased (combustion retarded) when a silent discharge is applied directly to the flame region, but that the flame propagation velocity is increased (combustion promoted) when a silent discharge is applied to the unburned gas mixture upstream of a flame. Two other recent works have considered the possibility of combustion enhancement in aircraft gas turbine engine combustor mixers by using a plasma-generating fuel nozzle, that employs an electric-arc or microwave plasma generator, to produce dissociated fuel or ionized fuel (Johnson et al 2001); and pulsed corona-enhanced detonation of fuel-air mixtures in jet engines (Wang et al 2003). In contrast to these prior works, we have employed a silent discharge plasma (SDP) reactor to break up large fuel molecules into smaller molecules and create free radicals or other active species in a gas stream before the fuel is mixed with an oxidizer and combusted. In experiments reported here, a cylindrical SDP reactor was used to 'activate' propane before mixing it with air and igniting the combustible gas mixture. With the plasma, the physical appearance of the flame changes and substantial changes in mass spectrometer fragmentation peaks are observed (e.g., propane fragments decrease and water and carbon dioxide increase). This indicates that the combustion process is

  8. Low-temperature CVD synthesis of patterned core-shell VO2@ZnO nanotetrapods and enhanced temperature-dependent field-emission properties

    Science.gov (United States)

    Yin, Haihong; Yu, Ke; Song, Changqing; Wang, Zhiliang; Zhu, Ziqiang

    2014-09-01

    VO2 nanostructures are attractive materials because of their reversible metal-insulator transition (MIT) and wide applications in devices. When they are used as field emitters, a new type of temperature-controlled field emission device can be fabricated. Vapor transport methods used to synthesize traditional VO2 nanostructures are energy-intensive, low yield, and produce simple morphology (quasi-1D) that exhibits substrate clamping; thus they are not suitable for field emission applications. To overcome these limitations, ZnO nanotetrapods were used as templates, and patterned core-shell VO2@ZnO nanotetrapods were successfully grown on an ITO/glass substrate via a low-temperature CVD synthesis. SEM, TEM, EDX, XPS analyses and X-ray diffraction revealed that the cores and shells of these nanotetrapods were single crystal wurtzite-type ZnO and polycrystalline VO2, respectively. The VO2@ZnO nanotetrapods show strongly MIT-related FE properties, the emission current density at low temperature is significantly enhanced in comparison with pure VO2 nanostructures, and the emission current density increased by about 20 times as the ambient temperature increased from 25 to 105 °C at a fixed field of 5 V μm-1. Although the VO2@ZnO nanotetrapods show a worse FE performance at low temperatures compared with pure ZnO nanotetrapods, the FE performance was substantially improved at high temperatures, which was attributed to the MIT-related band bending near the interface and the abrupt resistance change across the MIT.

  9. Hot-electron refluxing enhanced relativistic transparency of overdense plasmas

    CERN Document Server

    Yu, Yong; Chen, Zi-Yu; Wang, Jia-Xiang; Zhu, Wen-Jun

    2013-01-01

    A new phenomenon of enhancing the relativistic transparency of overdense plasmas by the influence of hot-electron refluxing has been found via particle-in-cell simulations. When a p-polarized laser pulse, with intensity below the self-induced-transparency (SIT) threshold, obliquely irradiates a thin overdense plasma, the initially opaque plasma would become transparent after a time interval which linearly relies on the thickness of the plasma. This phenomenon can be interpreted by the influence of hot-electron refluxing. As the laser intensity is higher than the SIT threshold, the penetration velocity of the laser in the plasma is enhanced when the refluxing is presented. Simulation data with ion motion considered is also consistent with the assumption that hot-electron refluxing enhances transparency. These results have potential applications in laser shaping.

  10. Synthesis of Few-Layer Graphene Using DC PE-CVD

    Science.gov (United States)

    Kim, Jeong Hyuk; Castro, Edward Joseph D.; Hwang, Yong Gyoo; Lee, Choong Hun

    2011-12-01

    Few layer graphene (FLG) had been successfully grown on polycrystalline Ni films or foils on a large scale using DC Plasma Enhanced Chemical Vapor Deposition (DC PE-CVD) as a result of the Raman spectra drawn out of the sample. The size of graphene films is dependent on the area of the Ni film as well as the DC PE-CVD chamber size. Synthesis time has an effect on the quality of graphene produced. However, further analysis and experiments must be pursued to further identify the optimum settings and conditions of producing better quality graphene. Applied plasma voltage on the other hand, had an influence on the minimization of defects in the graphene grown. It has also presented a method of producing a free standing PMMA/graphene membrane on a FeCl3(aq) solution which could then be transferred to a desired substrate.

  11. Raman Enhancement of a Dipolar Molecule on CVD Graphene%偶极分子在CVD石墨烯表面的拉曼增强

    Institute of Scientific and Technical Information of China (English)

    冷艳丹; 周俊琪; 张宏超; 黄长水

    2015-01-01

    选用CVD制备的石墨烯作为拉曼增强的基底,以激光器波长λ=532 nm的显微拉曼光谱仪对偶极分子DREP分子的石墨烯拉曼增强效应进行了探究。通过对石墨烯上与SiO2片上DREP分子的拉曼强度的对照,发现单纯DREP/SiO2分子浓度很低时,拉曼峰基本不存在,直到达到一定浓度1×10-5 mol・L -1时,其拉曼峰才出现;随着浓度的增加,DREP分子的拉曼信号和荧光信号都增加;而DREP/Graphene/SiO2在1×10-7 mol・L -1时即出现了拉曼信号,随着浓度的增加,拉曼信号增加很快而荧光信号增加并不明显。结果表明石墨烯可实现DREP分子的拉曼增强,并能猝灭荧光背底,提高拉曼信号与荧光信号之比。对比了不同偶极矩的DREP和DR1P分子,表明偶极矩越大,其增强因子越大,增强程度越强。分析了DREP分子在石墨烯上的拉曼增强的机制。DREP分子是尾端接芘的经过改性的偶氮苯分子,其尾端的芘与石墨烯于界面处通过π—π相互作用进行电子转移,改变石墨烯的能级结构使得其发生P型掺杂,发生拉曼增强的机制是化学机制。DREP分子的石墨烯拉曼增强效应有助于我们研究石墨烯以及石墨烯表面拉曼增强机制,比如石墨烯的载流子转移,化学增强机制的原理,以及如何从电磁机制效应分离出化学机制。%The CVD graphene was chosen as the Raman enhancement substrate ,graphene‐enhanced Raman scattering(GERS) of dipolar molecule DREP were explored with a laser wavelengthλ=532 nm of micro‐Raman spectroscopy .Upon comparison of the raman signal of DREP molecular latched to a graphene /SiO2 substrate and to a bare SiO2 substrate ,we found that the Raman signal of pure DREP molecule basically does not exist at low concentrations ,until it reaches a certain concentration of 1 × 10-5 mol・L -1 ,its Raman signal emerging and as the increasing of the

  12. Developing the Beijing CVD

    Institute of Scientific and Technical Information of China (English)

    LU JINGXIAN

    2006-01-01

    @@ Slowly but surely, the high-end villa property in Beijing is gaining new momentum. Limited amounts of new properties, rising prices and increasing demand will be the trend in the villa market in 2006, real estate experts predict. Among them, the exclusive Central Villa District(CVD), a top-tier villa area along the Wenyu River in northeast Beijing, has emerged as a hot spot of the market.

  13. Regimes of enhanced electromagnetic emission in beam-plasma interactions

    Energy Technology Data Exchange (ETDEWEB)

    Timofeev, I. V.; Annenkov, V. V.; Arzhannikov, A. V. [Budker Institute of Nuclear Physics, SB RAS, 630090 Novosibirsk, Russia and Novosibirsk State University, 630090 Novosibirsk (Russian Federation)

    2015-11-15

    The ways to improve the efficiency of electromagnetic waves generation in laboratory experiments with high-current relativistic electron beams injected into a magnetized plasma are discussed. It is known that such a beam can lose, in a plasma, a significant part of its energy by exciting a high level of turbulence and heating plasma electrons. Beam-excited plasma oscillations may simultaneously participate in nonlinear processes resulting in a fundamental and second harmonic emissions. It is obvious, however, that in the developed plasma turbulence the role of these emissions in the total energy balance is always negligible. In this paper, we investigate whether electromagnetic radiation generated in the beam-plasma system can be sufficiently enhanced by the direct linear conversion of resonant beam-driven modes into electromagnetic ones on preformed regular inhomogeneities of plasma density. Due to the high power of relativistic electron beams, the mechanism discussed may become the basis for the generator of powerful sub-terahertz radiation.

  14. Regimes of enhanced electromagnetic emission in beam-plasma interactions

    Science.gov (United States)

    Timofeev, I. V.; Annenkov, V. V.; Arzhannikov, A. V.

    2015-11-01

    The ways to improve the efficiency of electromagnetic waves generation in laboratory experiments with high-current relativistic electron beams injected into a magnetized plasma are discussed. It is known that such a beam can lose, in a plasma, a significant part of its energy by exciting a high level of turbulence and heating plasma electrons. Beam-excited plasma oscillations may simultaneously participate in nonlinear processes resulting in a fundamental and second harmonic emissions. It is obvious, however, that in the developed plasma turbulence the role of these emissions in the total energy balance is always negligible. In this paper, we investigate whether electromagnetic radiation generated in the beam-plasma system can be sufficiently enhanced by the direct linear conversion of resonant beam-driven modes into electromagnetic ones on preformed regular inhomogeneities of plasma density. Due to the high power of relativistic electron beams, the mechanism discussed may become the basis for the generator of powerful sub-terahertz radiation.

  15. Enhancing the plasma illumination behaviour of microplasma devices using microcrystalline/ultra-nanocrystalline hybrid diamond materials as cathodes.

    Science.gov (United States)

    Chang, Tinghsun; Lou, Shiucheng; Chen, Huangchin; Chen, Chulung; Lee, Chiyoung; Tai, Nyanhwa; Lin, Inan

    2013-08-21

    The properties of capacity-type microplasma devices were significantly enhanced due to the utilisation of hybrid diamond films as cathodes. The performance of the microplasma devices was closely correlated with the electron field emission (EFE) properties of the diamond cathode materials. The nanoemitters, which were prepared by growing duplex-structured diamond films [microcrystalline diamond (MCD)/ultra-nanocrystalline diamond (UNCD)] on Si-pyramid templates via a two-step microwave plasma enhanced chemical vapour deposition (MPE-CVD) process, exhibited improved EFE properties (E0 = 5.99 V μm(-1), J(e) = 1.10 mA cm(-2) at 8.50 V μm(-1) applied field), resulting in superior microplasma device performance (with a lower threshold field of 200 V mm(-1) and a higher plasma current density of 7.80 mA cm(-2)) in comparison with UNCD film devices prepared using a single-step MPE-CVD process. The superior EFE properties of the duplex-structured MCD-UNCD films relative to those of the UNCD films can be attributed to the unique granular structure of the diamond films. High-resolution transmission electron microscopy reveals that the MCD-UNCD films consisted of abundant graphitic phases located at the periphery of large diamond aggregates and at the boundaries between the ultra-small diamond grains. The presence of the graphite phase is presumed to be the prime factor that renders these films more conductive and causes these films to exhibit higher EFE properties, thus resulting in the improved plasma illumination properties of the microplasma devices.

  16. Correlation between optical emission spectra and the process parameters of a 915 MHz microwave plasma CVD reactor used for depositing polycrystalline diamond coatings

    Indian Academy of Sciences (India)

    Awadesh Kumar Mallik; Sandip Bysakh; Someswar Dutta; Debabrata Basu

    2014-08-01

    In this paper, the hydrogen and hydrogen-methane mixed plasma have been generated inside a 33 cm diameter quartz bell jar with a low power (9 KW) and lower frequency 915 MHz microwave plasma chemical vapor deposition system. The reactor is being used for growing polycrystalline diamond (PCD) over large area (100 mm). The generated plasma is diagnosed by in situ optical emission spectroscopy method with wave length ranging from 200 to 900 nm. The effects of microwave power, chamber pressure and gas concentration on plasma characteristics have been studied in this work. Within the optical range, Balmer H, H, C2swan band and CH lines have been detected at the wavelengths of 655.95, 485.7, 515.82 and 430.17 nm, respectively. It has been observed that for hydrogen plasma, the amount of transition from hydrogen atom inner shell 3 to 2 (H) is almost constant with increasing microwave (MW) power (from 2000 to 2800 W) and pressure (from 15 to 30 Torr) initially, after that it increases with further increase of MW power and pressure, whereas, the transition from 4 to 2 (H) is slowly increased with increasing MW power and pressure. For hydrogen-methane plasma, intensities of C2 swan band, i.e., the transitions from D$^3\\Pi_\\text{g}$ to A$^3\\Pi_{\\mu}$ energy levels, are also increased with the increasing microwave power and reactor pressure. It has been observed that the radicals present in the plasma are affected by variation of different reactor parameters like pressure, MW power, CH4 concentration, etc.

  17. Ultrasound enhanced plasma surface modification at atmospheric pressure

    DEFF Research Database (Denmark)

    Kusano, Yukihiro; Singh, Shailendra Vikram; Norrman, Kion

    Atmospheric pressure plasma treatment can be highly enhanced by simultaneous high-power ultrasonic irradiation onto the treating surface. It is because ultrasonic waves with a sound pressure level (SPL) above approximately 140 dB can reduce the thickness of a boundary gas layer between the plasma...... and the material surface, and thus many reactive species generated in the plasma can reach the surface before inactivated, and be efficiently utilized for surface modification. In the present work polyester plates are treated using a dielectric barrier discharge (DBD) and a gliding arc at atmospheric pressure...... irradiation, the water contact angle dropped markedly, and tended to decrease furthermore at higher power. The ultrasonic irradiation during the plasma treatment consistently improved the wettability. Oxygen containing polar functional groups were introduced at the surface by the plasma treatment...

  18. Transport mechanisms through PE-CVD coatings: influence of temperature, coating properties and defects on permeation of water vapour

    Science.gov (United States)

    Kirchheim, Dennis; Jaritz, Montgomery; Mitschker, Felix; Gebhard, Maximilian; Brochhagen, Markus; Hopmann, Christian; Böke, Marc; Devi, Anjana; Awakowicz, Peter; Dahlmann, Rainer

    2017-03-01

    Gas transport mechanisms through plastics are usually described by the temperature-dependent Arrhenius-model and compositions of several plastic layers are represented by the CLT. When it comes to thin films such as plasma-enhanced chemical vapour deposition (PE-CVD) or plasma-enhanced atomic layer deposition (PE-ALD) coatings on substrates of polymeric material, a universal model is lacking. While existing models describe diffusion through defects, these models presume that permeation does not occur by other means of transport mechanisms. This paper correlates the existing transport models with data from water vapour transmission experiments.

  19. PE-CVD fabrication of germanium nanoclusters for memory applications

    Energy Technology Data Exchange (ETDEWEB)

    Duerkop, T. [Institut fuer Materialien und Bauelemente der Elektronik, Leibniz Universitaet Hannover, Appelstrasse 11a, 30167 Hannover (Germany)], E-mail: duerkop@mbe.uni-hannover.de; Bugiel, E. [Institut fuer Materialien und Bauelemente der Elektronik, Leibniz Universitaet Hannover, Appelstrasse 11a, 30167 Hannover (Germany); Costina, I. [IHP GmbH, Im Technologiepark 25, 15236 Frankfurt (Oder) (Germany); Ott, A.; Peibst, R.; Hofmann, K.R. [Institut fuer Materialien und Bauelemente der Elektronik, Leibniz Universitaet Hannover, Appelstrasse 11a, 30167 Hannover (Germany)

    2008-02-15

    We have investigated Ge nanoclusters (Ge-NC) embedded in silicon dioxide, whose fundamental properties promise improved characteristics in NC flash memory devices as compared to Si nanoclusters. We present a simple new method, based on plasma-enhanced CVD (PE-CVD) deposition of amorphous Ge (a-Ge) onto SiO{sub 2}, to create gate stacks with embedded Ge-NC at vertically well-controlled positions suitable for use in flash memory devices. This process minimizes the exposure of Ge to environmental influences by depositing a-Ge as well as a SiO{sub 2} cap layer in situ within the same deposition chamber. Subsequent high-temperature anneals compatible with the temperature budget of CMOS processing are used for the actual cluster formation. Variation of annealing temperature and duration of this step as well as the thickness of the initial Ge layer controls the average cluster radius and density, as determined by transmission electron microscopy (TEM). Measurements of electrical properties show the capability of samples with NC to store charge.

  20. SiC-Si[sub 3]N[sub 4] composite coatings produced by plasma-enhanced chemical vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Gerretsen, J. (Centre for Technical Ceramics, Netherlands Organization for Applied Scientific Research, Eindhoven (Netherlands)); Kirchner, G. (Centre for Technical Ceramics, Netherlands Organization for Applied Scientific Research, Eindhoven (Netherlands)); Kelly, T. (Irish Science and Technology Agency, Dublin (Ireland)); Mernagh, V. (Irish Science and Technology Agency, Dublin (Ireland)); Koekoek, R. (Tempress, Hoogeveen (Netherlands)); McDonnell, L. (Tekscan Ltd., Cork (Ireland))

    1993-10-08

    Silicon carbonitride coatings have been produced by plasma-enhanced chemical vapour deposition (CVD) on AISI 440C steel in a hot-wall reactor at 250 C from a mixture of SiH[sub 4], N[sub 2]-NH[sub 3] and C[sub 2]H[sub 4], and analysed by electron probe microanalysis and Rutherford backscattering spectroscopy-elastic recoil detection. Coatings with different ratios of silicon carbide to silicon nitride and silicon suband superstoichiometries have been deposited. Stoichiometric coatings show a maximum in their mechanical properties. Depending on the SiC-to-Si[sub 3]N[sub 4] ratio, the Knoop hardness values vary between 1500 and 2800 HK[sub 0.025]. Internal stress is low at a level of 100-300 MPa. The pinhole density is less than 2 cm[sup -2]. The fracture toughness as determined from indention tests is 4 MPa m[sup 1/2]. Linear polarization testing results show excellent protection of the substrate material against chemically aggressive media as compared with conventional CVD. (orig.)

  1. Cell proliferation on modified DLC thin films prepared by plasma enhanced chemical vapor deposition.

    Science.gov (United States)

    Stoica, Adrian; Manakhov, Anton; Polčák, Josef; Ondračka, Pavel; Buršíková, Vilma; Zajíčková, Renata; Medalová, Jiřina; Zajíčková, Lenka

    2015-06-12

    Recently, diamondlike carbon (DLC) thin films have gained interest for biological applications, such as hip and dental prostheses or heart valves and coronary stents, thanks to their high strength and stability. However, the biocompatibility of the DLC is still questionable due to its low wettability and possible mechanical failure (delamination). In this work, DLC:N:O and DLC: SiOx thin films were comparatively investigated with respect to cell proliferation. Thin DLC films with an addition of N, O, and Si were prepared by plasma enhanced CVD from mixtures of methane, hydrogen, and hexamethyldisiloxane. The films were optically characterized by infrared spectroscopy and ellipsometry in UV-visible spectrum. The thickness and the optical properties were obtained from the ellipsometric measurements. Atomic composition of the films was determined by Rutherford backscattering spectroscopy combined with elastic recoil detection analysis and by x-ray photoelectron spectroscopy. The mechanical properties of the films were studied by depth sensing indentation technique. The number of cells that proliferate on the surface of the prepared DLC films and on control culture dishes were compared and correlated with the properties of as-deposited and aged films. The authors found that the level of cell proliferation on the coated dishes was high, comparable to the untreated (control) samples. The prepared DLC films were stable and no decrease of the biocompatibility was observed for the samples aged at ambient conditions.

  2. Ultrasound enhanced plasma surface modification at atmospheric pressure

    DEFF Research Database (Denmark)

    Kusano, Yukihiro; Singh, Shailendra Vikram; Norrman, Kion

    2012-01-01

    Efficiency of atmospheric pressure plasma treatment can be highly enhanced by simultaneous high power ultrasonic irradiation onto the treating surface. It is because ultrasonic waves with a sound pressure level (SPL) above ∼140 dB can reduce the thickness of a boundary gas layer between the plasma...... and the material surface, and thus, many reactive species generated in the plasma can reach the surface before they are inactivated and can be efficiently utilised for surface modification. In the present work, glass fibre reinforced polyester plates were treated using a dielectric barrier discharge and a gliding...... arc at atmospheric pressure to study adhesion improvement. The effect of ultrasonic irradiation with the frequency diapason between 20 and 40 kHz at the SPL of ∼150 dB was investigated. After the plasma treatment without ultrasonic irradiation, the wettability was significantly improved...

  3. Enhancement of space plasma images by complex wavelets

    Energy Technology Data Exchange (ETDEWEB)

    Souza, Vitor Moura; Domingues, Margarete Oliveira; Mendes, Odim, E-mail: vitor.souza@inpe.br [Instituto Nacional de Pesquisas Espaciais (INPE), Sao Jose dos Campos, SP (Brazil); Pagamisse, Aylton [Universidade Estadual Paulista Julio de Mesquita Filho (UNESP), Presidente Prudente, SP (Brazil). Fav. de Ciencias e Tecnologia; Stenborg, Guilhermo Adrian [College of Science, George Mason University, Fairfax, VA (United States)

    2015-10-15

    The Sun is a natural laboratory for plasma processes. A myriad of instruments aboard satellites and on ground record(ed) the plasma emission in different ranges of the electromagnetic spectrum to help understand such processes. In particular, in the outer part of the solar atmosphere, the solar corona, we can observe a multitude of electrodynamical phenomena. There, the faint corona emission and the associated dynamic plasma structures (e.g., coronal mass ejections - CMEs) recorded in white light images can be used as basis for some insight of this physical scenario. In order to characterize the dynamics and morphology of such structures in a better way, it seems crucial that some features of those images should be enhanced. To deal with this need, a new approach using a complex wavelet transform methodology was developed. With the proposed methodology, we can highlight the plasma ejections improving the identification of those structures. (author)

  4. Plasma Treated TiO2 Nanoparticles for Dispersion Enhancement

    Institute of Scientific and Technical Information of China (English)

    WANG Ying; LI Chun; ZHANG Jing

    2009-01-01

    TiO2 nanoparticles were treated in a fluidized reactor by introducing Hexamethyldisiloxane(HMDSO)plasma monomer.The organic HMDSO-polymer vapor was condensed on the nanoparticles and lowered their surface energy.This plasma treatment was harmless to the crystal lattice of the TiO2 nanoparticles.The treated nanoparticles were mixed in glycol solutions and polymerized into TiO2-polyester composites for studying the effect of plasma deposition on dispersion.It Was found that the dispersion of the TiO2 nanoparticles in both glycol and the polyester matrix Was significantly improved due to lower surface energy and HMDSO plasma treatment, as from ultraviolet absorbency measurements and scanning electron microscopy observation.The theory of colloid stability successfully explained the dispersion enhancement of TiO2 nanoparticles in glycol.

  5. On the generation of magnetic field enhanced microwave plasma line

    Science.gov (United States)

    Chen, Longwei; Zhao, Ying; Wu, Kenan; Wang, Qi; Meng, Yuedong; Ren, Zhaoxing

    2016-12-01

    Microwave linear plasmas sustained by surface waves have attracted much attention due to the potential abilities to generate large-scale and uniform non-equilibrium plasmas. An external magnetic field was generally applied to enhance and stabilize plasma sources because the magnetic field decreased the electron losses on the wall. The effects of magnetic field on the generation and propagation mechanisms of the microwave plasma were tentatively investigated based on a 2-D numerical model combining a coupled system of Maxwell's equations and continuity equations. The mobility of electrons and effective electric conductivity of the plasma were considered as a full tensor in the presence of magnetic field. Numerical results indicate that both cases of magnetic field in the axial-direction and radial-direction benefit the generation of a high-density plasma; the former one allows the microwave to propagate longer in the axis direction compared to the latter one. The time-averaged power flow density and the amplitude of the electric field on the inner rod of coaxial waveguide attenuate with the propagation of the microwave for both cases of with and without external magnetic field. The attenuation becomes smaller in the presence of appropriately higher axial-direction magnetic field, which allows more microwave energies to transmit along the axial direction. Meanwhile, the anisotropic properties of the plasma, like electron mobility, in the presence of the magnetic field confine more charged particles in the direction of the magnetic field line.

  6. Atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) of poly(diethylallylphosphate) coating: a char-forming protective coating for cellulosic textile.

    Science.gov (United States)

    Hilt, Florian; Boscher, Nicolas D; Duday, David; Desbenoit, Nicolas; Levalois-Grützmacher, Joëlle; Choquet, Patrick

    2014-01-01

    An innovative atmospheric pressure chemical vapor deposition method toward the deposition of polymeric layers has been developed. This latter involves the use of a nanopulsed plasma discharge to initiate the free-radical polymerization of an allyl monomer containing phosphorus (diethylallylphosphate, DEAP) at atmospheric pressure. The polymeric structure of the film is evidence by mass spectrometry. The method, highly suitable for the treatment of natural biopolymer substrate, has been carried out on cotton textile to perform the deposition of an efficient and conformal protective coating.

  7. Equatorial plasma bubbles with enhanced ion and electron temperatures

    Science.gov (United States)

    Park, Jaeheung; Min, Kyoung Wook; Kim, Vitaly P.; Kil, Hyosub; Su, Shin-Yi; Chao, Chi Kuang; Lee, Jae-Jin

    2008-09-01

    While the ion and electron temperatures inside equatorial plasma bubbles (EPBs) are normally lower than those in an ambient plasma, bubbles with enhanced temperatures (BETs) are found occasionally in the topside ionosphere. Here we report the characteristics of BETs identified from observations of the first Republic of China Satellite (ROCSAT-1), the first Korea Multi-purpose Satellite (KOMPSAT-1), and the Defense Meteorological Satellite Program (DMSP) F15 during the solar maximum period between 2000 and 2001. The oxygen ion fraction inside the BETs, which was no lower than that of the ambient ionosphere, was similar to the case of ordinary low-temperature EPBs. These observations indicate that the BETs and low-temperature EPBs detected on the topside were produced by the upward drift of low-density plasma from lower altitudes. The feature that distinguishes BETs from normal EPBs is the occurrence of an unusually fast poleward field-aligned plasma flow relative to the ambient plasma. The BETs occurred preferentially around geomagnetic latitudes of 10° in the summer hemisphere, where the ambient ion and electron temperatures are lower than those in the conjugate winter hemisphere. The occurrence of BETs did not show any notable dependence on geomagnetic activities. The characteristics of the BETs suggest that the BETs were produced by adiabatic plasma heating associated with a fast poleward oxygen ion transport along magnetic flux tubes.

  8. Elemental abundances of flaring solar plasma - Enhanced neon and sulfur

    Science.gov (United States)

    Schmelz, J. T.

    1993-01-01

    Elemental abundances of two flares observed with the SMM Flat Crystal Spectrometer are compared and contrasted. The first had a gradual rise and a slow decay, while the second was much more impulsive. Simultaneous spectra of seven bright soft X-ray resonance lines provide information over a broad temperature range and are available throughout both flares, making these events unique in the SMM data base. For the first flare, the plasma seemed to be characterized by coronal abundances but, for the second, the plasma composition could not be coronal, photospheric, or a linear combination of both. A good differential emission measure fit required enhanced neon such that Ne/O = 0.32 +/- 0.02, a value which is inconsistent with the current models of coronal abundances based on the elemental first-ionization potential. Similar values of enhanced neon are found for flaring plasma observed by the SMM gamma-ray spectrometer, in (He-3)-rich solar energetic particle events, and in the decay phase of several long duration soft X-ray events. Sulfur is also enhanced in the impulsive flare, but not as dramatically as neon. These events are compared with two models which attempt to explain the enhanced values of neon and sulfur.

  9. Enhancing Cold Atmospheric Plasma Treatment Efficiency for Cancer Therapy

    Science.gov (United States)

    Cheng, Xiaoqian

    To improve efficiency and safety of anti-cancer therapies the researchers and clinicians alike are prompted to develop targeted combined therapies that especially minimize damage to healthy tissues while eradicating the body of cancerous tissues. Previous research in cold atmospheric plasma (CAP) and cancer cell interaction has repeatedly proven that cold plasma induced cell death. In this study, we seek to integrate the medical application of CAP. We proposed and implemented 3 novel ideas to enhance efficacy and selectivity of cancer therapy. It is postulated that the reactive oxygen species (ROS) and reactive nitrogen species (RNS) play a major role in the CAP cancer therapy. We determined a mechanism of CAP therapy on glioblastoma cells (U87) through an understanding of the composition of CAP, including output voltage, treatment time, and gas flow-rate. We varied the characteristics of the cold plasma in order to obtain different major species (such as O, OH, N2+, and N2 lines). "plasma dosage" D ~ Q * V * t. is defined, where D is the entire "plasma dosage"; Q is the flow rate of feeding gas; V is output voltage; t is treatment time. The proper CAP dosage caused 3-fold cell death in the U87 cells compared to the normal human astrocytes E6/E7 cells. We demonstrated there is a synergy between AuNPS and CAP in cancer therapy. Specifically, the concentration of AuNPs plays an important role on plasma therapy. At an optimal concentration, gold nanoparticles can significantly induce U87 cell death up to a 30% overall increase compared to the control group with the same plasma dosage but no AuNPs applied. The ROS intensity of the corresponding conditions has a reversed trend compared to cell viability. This matches with the theory that intracellular ROS accumulation results in oxidative stress, which further changes the intracellular pathways, causing damage to the proteins, lipids and DNA. Our results show that this synergy has great potential in improving the

  10. 2D modeling and simulation of the flow dynamics, electric field and reactions in a low-temperature, atmospheric-pressure nitrogen plasma sharp-end plate-to-plane configuration and CVD reactor

    Science.gov (United States)

    De Wilde, Juray; Lorant, Christophe; Descamps, Pierre

    2017-04-01

    In atmospheric-pressure plasma reactors, the flow dynamics can be complex, determine the reactor performance and complicate scale-up. Coupling computational fluid dynamics to the calculation of the electric field and plasma chemistry is challenging because of the numerical stiffness introduced by the difference in time scale of the different phenomena involved. Focusing on low-temperature, atmospheric-pressure pure nitrogen plasma, a model and model reduction based solution strategy to deal with the numerical stiffness are presented and evaluated. The influence of the electric field on the flow dynamics and species concentration fields is first qualitatively studied by means of 2D simulations of a sharp-end plate-to-plane configuration. Next, a specific reactor prototype for low-temperature, atmospheric-pressure plasma-enhanced chemical vapor deposition for in-line surface treatments is simulated to illustrate the importance of accounting for the detailed flow dynamics.

  11. Enhanced field emission of plasma treated multilayer graphene

    Energy Technology Data Exchange (ETDEWEB)

    Khare, Ruchita T.; More, Mahendra A. [Department of Physics, Center for Advanced Studies in Material Science and Condensed Matter Physics, S P Pune University, Pune 411007 (India); Gelamo, Rogerio V. [Instituto de Ciências Tecnológicas e Exatas, UFTM, Uberaba, Minas Gerais 38025-180 (Brazil); Late, Dattatray J., E-mail: dj.late@ncl.res.in, E-mail: csrout@iitbbs.ac.in [Physical and Materials Chemistry Division, CSIR-National Chemical Laboratory, Dr. Homi Bhabha Road, Pune 411008, Maharashtra (India); Rout, Chandra Sekhar, E-mail: dj.late@ncl.res.in, E-mail: csrout@iitbbs.ac.in [School of Basic Sciences, Indian Institute of Technology, Bhubaneswar 751013, Odisha (India)

    2015-09-21

    Electron emission properties of multilayer graphene (MLG) prepared by a facile exfoliation technique have been studied. Effect of CO{sub 2} Ar, N{sub 2}, plasma treatment was studied using Raman spectroscopy and investigated for field emission based application. The CO{sub 2} plasma treated multilayer graphene shows an enhanced field emission behavior with a low turn on field of 0.18 V/μm and high emission current density of 1.89 mA/cm{sup 2} at an applied field of 0.35 V/μm. Further the plasma treated MLG exhibits excellent current stability at a lower and higher emission current value.

  12. Enhancement of pulverized coal combustion by plasma technology

    Energy Technology Data Exchange (ETDEWEB)

    Gorokhovski, M.A.; Jankoski, Z.; Lockwood, F.C.; Karpenko, E.I.; Messerle, V.E.; Ustimenko, A.B. [University of Rouen, Rouen (France)

    2007-07-01

    Plasma-assisted pulverized coal combustion is a promising technology for thermal power plants (TPP). This article reports one- and three- dimensional numerical simulations, as well as laboratory and industrial measurements of coal combustion using a plasma-fuel system (PFS). The chemical kinetic and fluid mechanics involved in this technology are analysed. The results show that a PFS, can be used to promote early ignition and enhanced stabilization of a pulverized coal flame. It is shown that this technology, in addition to enhancing the combustion efficiency of the flame, reduces harmful emissions from power coals of all ranks (brown, bituminous, anthracite and their mixtures). Data summarising the experience of 27 pulverized coal boilers in 16 thermal power plants in several countries (Russia, Kazakhstan, Korea, Ukraine, Slovakia, Mongolia and China), embracing steam productivities from 75 to 670 tons per hour (TPH), are presented. Finally, the practical computation of the characteristics of the PFS, as function of coal properties, is discussed.

  13. Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane

    Energy Technology Data Exchange (ETDEWEB)

    Weeks, Stephen, E-mail: Stephen.Weeks@intermolecular.com; Nowling, Greg; Fuchigami, Nobi; Bowes, Michael; Littau, Karl [Intermolecular, 3011 North 1st Street, San Jose, California 95134 (United States)

    2016-01-15

    Progress in transistor scaling has increased the demands on the material properties of silicon nitride (SiN{sub x}) thin films used in device fabrication and at the same time placed stringent restrictions on the deposition conditions employed. Recently, low temperature plasma enhanced atomic layer deposition has emerged as a viable technique for depositing these films with a thermal budget compatible with semiconductor processing at sub-32 nm technology nodes. For these depositions, it is desirable to use precursors that are free from carbon and halogens that can incorporate into the film. Beyond this, it is necessary to develop processing schemes that minimize the wet etch rate of the film as it will be subjected to wet chemical processing in subsequent fabrication steps. In this work, the authors introduce low temperature deposition of SiN{sub x} using neopentasilane [NPS, (SiH{sub 3}){sub 4}Si] in a plasma enhanced atomic layer deposition process with a direct N{sub 2} plasma. The growth with NPS is compared to a more common precursor, trisilylamine [TSA, (SiH{sub 3}){sub 3 }N] at identical process conditions. The wet etch rates of the films deposited with NPS are characterized at different plasma conditions and the impact of ion energy is discussed.

  14. Front surface structured targets for enhancing laser-plasma interactions

    Science.gov (United States)

    Snyder, Joseph; George, Kevin; Ji, Liangliang; Yalamanchili, Sasir; Simonoff, Ethan; Cochran, Ginevra; Daskalova, Rebecca; Poole, Patrick; Willis, Christopher; Lewis, Nathan; Schumacher, Douglass

    2016-10-01

    We present recent progress made using front surface structured interfaces for enhancing ultrashort, relativistic laser-plasma interactions. Structured targets can increase laser absorption and enhance ion acceleration through a number of mechanisms such as direct laser acceleration and laser guiding. We detail experimental results obtained at the Scarlet laser facility on hollow, micron-scale plasma channels for enhancing electron acceleration. These targets show a greater than three times enhancement in the electron cutoff energy as well as an increased slope temperature for the electron distribution when compared to a flat interface. Using three-dimensional particle-in-cell (PIC) simulations, we have modeled the interaction to give insight into the physical processes responsible for the enhancement. Furthermore, we have used PIC simulations to design structures that are more advantageous for ion acceleration. Such targets necessitate advanced target fabrication methods and we describe techniques used to manufacture optimized structures, including vapor-liquid-solid growth, cryogenic etching, and 3D printing using two-photon-polymerization. This material is based upon work supported by the Air Force Office of Scientific Research under Award Number FA9550-14-1-0085.

  15. Enhanced chromium adsorption capacity via plasma modification of natural zeolites

    Science.gov (United States)

    Cagomoc, Charisse Marie D.; Vasquez, Magdaleno R., Jr.

    2017-01-01

    Natural zeolites such as mordenite are excellent adsorbents for heavy metals. To enhance the adsorption capacity of zeolite, sodium-exchanged samples were irradiated with 13.56 MHz capacitively coupled radio frequency (RF) argon gas discharge. Hexavalent chromium [Cr(VI)] was used as the test heavy metal. Pristine and plasma-treated zeolite samples were soaked in 50 mg/L Cr solution and the amount of adsorbed Cr(VI) on the zeolites was calculated at predetermined time intervals. Compared with untreated zeolite samples, initial Cr(VI) uptake was 70% higher for plasma-treated zeolite granules (50 W 30 min) after 1 h of soaking. After 24 h, all plasma-treated zeolites showed increased Cr(VI) uptake. For a 2- to 4-month period, Cr(VI) uptake increased about 130% compared with untreated zeolite granules. X-ray diffraction analyses between untreated and treated zeolite samples revealed no major difference in terms of its crystal structure. However, for plasma-treated samples, an increase in the number of surface defects was observed from scanning electron microscopy images. This increase in the number of surface defects induced by plasma exposure played a crucial role in increasing the number of active sorption sites on the zeolite surface.

  16. Combustion Enhancement Using a Silent Discharge Plasma Reactor

    Science.gov (United States)

    Rosocha, Louis; Platts, David; Coates, Don; Stange, Sy

    2003-10-01

    Electric fields affect flame propagation speed, stability, and combustion chemistry. External electrodes, arc discharges, and plasma jets have been used to combust gas mixtures outside their flammability limits. Experiments with silent electrical discharges (SEDs) and propagating flames have shown that flame propagation velocity is actually decreased (combustion retarded) when an SED is applied directly to the flame region, but velocity is increased (combustion promoted) when applied to the unburned gas mixture upstream of a flame. More recent work has proposed electric arc/microwave-driven plasma-generating fuel nozzles to produce dissociated fuel or ionized fuel for aircraft gas turbine engine combustor mixers. In contrast to prior works, we have used a silent discharge plasma (SDP) reactor to break up large fuel molecules into smaller molecules and create free radicals/active species in a gas stream before the fuel is mixed with an oxidizer and combusted. A cylindrical SDP reactor was used to 'activate' propane before mixing it with air and igniting the combustible gas mixture. With the plasma, the physical appearance of the flame changes and substantial changes in mass spectrometer fragmentation peaks for fuel and combustion products are observed (i.e., combustion is enhanced). Results of changes in the degree of combustion will be discussed in terms of variations in the plasma specific energy.

  17. Drastically Enhanced High-Rate Performance of Carbon-Coated LiFePO4 Nanorods Using a Green Chemical Vapor Deposition (CVD) Method for Lithium Ion Battery: A Selective Carbon Coating Process.

    Science.gov (United States)

    Tian, Ruiyuan; Liu, Haiqiang; Jiang, Yi; Chen, Jiankun; Tan, Xinghua; Liu, Guangyao; Zhang, Lina; Gu, Xiaohua; Guo, Yanjun; Wang, Hanfu; Sun, Lianfeng; Chu, Weiguo

    2015-06-03

    Application of LiFePO4 (LFP) to large current power supplies is greatly hindered by its poor electrical conductivity (10(-9) S cm(-1)) and sluggish Li+ transport. Carbon coating is considered to be necessary for improving its interparticle electronic conductivity and thus electrochemical performance. Here, we proposed a novel, green, low cost and controllable CVD approach using solid glucose as carbon source which can be extended to most cathode and anode materials in need of carbon coating. Hydrothermally synthesized LFP nanorods with optimized thickness of carbon coated by this recipe are shown to have superb high-rate performance, high energy, and power densities, as well as long high-rate cycle lifetime. For 200 C (18s) charge and discharge, the discharge capacity and voltage are 89.69 mAh g(-1) and 3.030 V, respectively, and the energy and power densities are 271.80 Wh kg(-1) and 54.36 kW kg(-1), respectively. The capacity retention of 93.0%, and the energy and power density retention of 93.6% after 500 cycles at 100 C were achieved. Compared to the conventional carbon coating through direct mixing with glucose (or other organic substances) followed by annealing (DMGA), the carbon phase coated using this CVD recipe is of higher quality and better uniformity. Undoubtedly, this approach enhances significantly the electrochemical performance of high power LFP and thus broadens greatly the prospect of its applications to large current power supplies such as electric and hybrid electric vehicles.

  18. Electronic properties of embedded graphene: doped amorphous silicon/CVD graphene heterostructures

    Science.gov (United States)

    Arezki, Hakim; Boutchich, Mohamed; Alamarguy, David; Madouri, Ali; Alvarez, José; Cabarrocas, Pere Roca i.; Kleider, Jean-Paul; Yao, Fei; Lee, Young Hee

    2016-10-01

    Large-area graphene film is of great interest for a wide spectrum of electronic applications, such as field effect devices, displays, and solar cells, among many others. Here, we fabricated heterostructures composed of graphene (Gr) grown by chemical vapor deposition (CVD) on copper substrate and transferred to SiO2/Si substrates, capped by n- or p-type doped amorphous silicon (a-Si:H) deposited by plasma-enhanced chemical vapor deposition. Using Raman scattering we show that despite the mechanical strain induced by the a-Si:H deposition, the structural integrity of the graphene is preserved. Moreover, Hall effect measurements directly on the embedded graphene show that the electronic properties of CVD graphene can be modulated according to the doping type of the a-Si:H as well as its phase i.e. amorphous or nanocrystalline. The sheet resistance varies from 360 Ω sq-1 to 1260 Ω sq-1 for the (p)-a-Si:H/Gr (n)-a-Si:H/Gr, respectively. We observed a temperature independent hole mobility of up to 1400 cm2 V-1 s-1 indicating that charge impurity is the principal mechanism limiting the transport in this heterostructure. We have demonstrated that embedding CVD graphene under a-Si:H is a viable route for large scale graphene based solar cells or display applications.

  19. Plasma Enhanced Chemical Vapour Deposition of Horizontally Aligned Carbon Nanotubes

    Directory of Open Access Journals (Sweden)

    Matthew T. Cole

    2013-05-01

    Full Text Available A plasma-enhanced chemical vapour deposition reactor has been developed to synthesis horizontally aligned carbon nanotubes. The width of the aligning sheath was modelled based on a collisionless, quasi-neutral, Child’s law ion sheath where these estimates were empirically validated by direct Langmuir probe measurements, thereby confirming the proposed reactors ability to extend the existing sheath fields by up to 7 mm. A 7 mbar growth atmosphere combined with a 25 W plasma permitted the concurrent growth and alignment of carbon nanotubes with electric fields of the order of 0.04 V μm−1 with linear packing densities of up to ~5 × 104 cm−1. These results open up the potential for multi-directional in situ alignment of carbon nanotubes providing one viable route to the fabrication of many novel optoelectronic devices.

  20. Characterization of the SiO2 film deposited by using plasma enhanced chemical vapor deposition (PECVD with TEOS/N2/O2

    Directory of Open Access Journals (Sweden)

    Meysam Zarchi

    2013-12-01

    Full Text Available The purpose of this study was to examine how certain parameters like temperature, pressure, and gas composition affect the characteristics of SiO2 film by Plasma Enhanced Chemical Vapor Deposition (PECVD. We used of low temperature and an inductively coupled plasma (ICP for various with gas mixtures of TEOS/N2/O2 at a given RF power and dc bias voltage. For the gas mixture with 40 sccm of N2 in TEOS, 100 standard cubic centimeters per minute (sccm of N2, and 500 sccm of O2, transparent and scratch-resistant SiO2 could be deposited with a deposition rate of 30 nm/min when RF power of 500 W and a dc-bias voltage of 350V were applied. The characteristics of the deposited SiO2, such as the composition, the binding energy, etc. were compared with the SiO2 deposited by using thermal CVD and evaporation. It was found that the SiO2 deposited by PECVD with TEOS/N2/O2 exhibited properties typical of SiO2 deposited applying thermal CVD and evaporation. The surface roughness of the 100 nm-thick SiO2 deposited by PECVD was similar to that of the substrate.

  1. Modeling for CVD of Solid Oxide Electrolyte

    Energy Technology Data Exchange (ETDEWEB)

    Starr, T.L.

    2002-09-18

    Because of its low thermal conductivity, high thermal expansion and high oxygen ion conductivity yttria-stabilized zirconia (YSZ) is the material of choice for high temperature electrolyte applications. Current coating fabrication methods have their drawbacks, however. Air plasma spray (APS) is a relatively low-cost process and is suitable for large and relatively complex shapes. it is difficult to produce uniform, relatively thin coatings with this process, however, and the coatings do not exhibit the columnar microstructure that is needed for reliable, long-term performance. The electron-beam physical vapor deposition (EB-PVD) process does produce the desirable microstructure, however, the capital cost of these systems is very high and the line-of-sight nature of the process limits coating uniformity and the ability to coat large and complex shapes. The chemical vapor deposition (CVD) process also produces the desirable columnar microstructure and--under proper conditions--can produce uniform coatings over complex shapes. CVD has been used for many materials but is relatively undeveloped for oxides, in general, and for zirconia, in particular. The overall goal of this project--a joint effort of the University of Louisville and Oak Ridge National Laboratory (ORNL)--is to develop the YSZ CVD process for high temperature electrolyte applications. This report describes the modeling effort at the University of Louisville, which supports the experimental work at ORNL. Early work on CVD of zirconia and yttria used metal chlorides, which react with water vapor to form solid oxide. Because of this rapid gas-phase reaction the water generally is formed in-situ using the reverse water-gas-shift reaction or a microwave plasma. Even with these arrangements gas-phase nucleation and powder formation are problems when using these precursors. Recent efforts on CVD of zirconia and YSZ have focused on use of metal-organic precursors (MOCVD). These are more stable in the gas

  2. Tungsten Deposition on Graphite using Plasma Enhanced Chemical Vapour Deposition.

    Science.gov (United States)

    Sharma, Uttam; Chauhan, Sachin S.; Sharma, Jayshree; Sanyasi, A. K.; Ghosh, J.; Choudhary, K. K.; Ghosh, S. K.

    2016-10-01

    The tokamak concept is the frontrunner for achieving controlled thermonuclear reaction on earth, an environment friendly way to solve future energy crisis. Although much progress has been made in controlling the heated fusion plasmas (temperature ∼ 150 million degrees) in tokamaks, technological issues related to plasma wall interaction topic still need focused attention. In future, reactor grade tokamak operational scenarios, the reactor wall and target plates are expected to experience a heat load of 10 MW/m2 and even more during the unfortunate events of ELM's and disruptions. Tungsten remains a suitable choice for the wall and target plates. It can withstand high temperatures, its ductile to brittle temperature is fairly low and it has low sputtering yield and low fuel retention capabilities. However, it is difficult to machine tungsten and hence usages of tungsten coated surfaces are mostly desirable. To produce tungsten coated graphite tiles for the above-mentioned purpose, a coating reactor has been designed, developed and made operational at the SVITS, Indore. Tungsten coating on graphite has been attempted and successfully carried out by using radio frequency induced plasma enhanced chemical vapour deposition (rf -PECVD) for the first time in India. Tungsten hexa-fluoride has been used as a pre-cursor gas. Energy Dispersive X-ray spectroscopy (EDS) clearly showed the presence of tungsten coating on the graphite samples. This paper presents the details of successful operation and achievement of tungsten coating in the reactor at SVITS.

  3. Plasma-enhanced Deposition of Nano-Structured Carbon Films

    Institute of Scientific and Technical Information of China (English)

    Yang Qiaoqin (杨巧勤); Xiao Chijin (肖持进); A. Hirose

    2005-01-01

    By pre-treating substrate with different methods and patterning the catalyst, selective and patterned growth of diamond and graphitic nano-structured carbon films have been realized through DC Plasma-Enhanced Hot Filament Chemical Vapor Deposition (PE-HFCVD).Through two-step processing in an HFCVD reactor, novel nano-structured composite diamond films containing a nanocrystalline diamond layer on the top of a nanocone diamond layer have been synthesized. Well-aligned carbon nanotubes, diamond and graphitic carbon nanocones with controllable alignment orientations have been synthesized by using PE-HFCVD. The orientation of the nanostructures can be controlled by adjusting the working pressure. In a Microwave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD) reactor, high-quality diamond films have been synthesized at low temperatures (310 ℃~550 ℃) without adding oxygen or halogen gas in a newly developed processing technique. In this process, carbon source originates from graphite etching, instead of hydrocarbon. The lowest growth temperature for the growth of nanocrystalline diamond films with a reasonable growth rate without addition of oxygen or halogen is 260 ℃.

  4. On the origin of self-organization of SiO2 nanodots deposited by CVD enhanced by atmospheric pressure remote microplasma

    Science.gov (United States)

    Arnoult, G.; Belmonte, T.; Kosior, F.; Dossot, M.; Henrion, G.

    2011-05-01

    The origin of organization of nanostructured silica coatings deposited on stainless steel substrates by remote microplasma at atmospheric pressure is investigated. We show by resorting to thermal camera measurements coupled with modelling that deposition, limited to a few seconds in time, occurs at low temperature (~below 420 K) although the gas temperature may reach 1400 K. Raman analyses of deposited films with thicknesses below 1 µm show the presence of oxidized silicon bonded to the metallic surface. The origin of nanodots is explained as follows. Close to the microplasma nozzle, the concentration of oxidizing species and/or the temperature being high enough, a silica thin film is obtained, leading to ceramic-metallic oxide interface that leads to a Volmer-Weber growth mode and to the synthesis of 3D structures over long treatment times. Far from the nozzle, the reactivity decreasing, thin films get a plasma-polymer like behaviour which leads to a Franck-Van der Merwe growth mode and films with a higher density. Other nanostructures, made of hexagonal cells, are observed but remain unexplained.

  5. On the origin of self-organization of SiO{sub 2} nanodots deposited by CVD enhanced by atmospheric pressure remote microplasma

    Energy Technology Data Exchange (ETDEWEB)

    Arnoult, G; Belmonte, T; Kosior, F; Henrion, G [Institut Jean Lamour, Department of Physics and Chemistry of Solids and Surfaces, UMR 7198 CNRS, Nancy-Universite, Parc de Saurupt, CS 14234, F-54042 Nancy Cedex (France); Dossot, M, E-mail: thierry.belmonte@mines.inpl-nancy.fr [Laboratoire de Chimie Physique et Microbiologie pour l' Environnement, UMR 7564 CNRS - Universite Henri Poincare, Nancy-Universite, 405, rue de Vandoeuvre, F-54600 Villers-les-Nancy (France)

    2011-05-04

    The origin of organization of nanostructured silica coatings deposited on stainless steel substrates by remote microplasma at atmospheric pressure is investigated. We show by resorting to thermal camera measurements coupled with modelling that deposition, limited to a few seconds in time, occurs at low temperature ({approx}below 420 K) although the gas temperature may reach 1400 K. Raman analyses of deposited films with thicknesses below 1 {mu}m show the presence of oxidized silicon bonded to the metallic surface. The origin of nanodots is explained as follows. Close to the microplasma nozzle, the concentration of oxidizing species and/or the temperature being high enough, a silica thin film is obtained, leading to ceramic-metallic oxide interface that leads to a Volmer-Weber growth mode and to the synthesis of 3D structures over long treatment times. Far from the nozzle, the reactivity decreasing, thin films get a plasma-polymer like behaviour which leads to a Franck-Van der Merwe growth mode and films with a higher density. Other nanostructures, made of hexagonal cells, are observed but remain unexplained.

  6. Evolution of plasma parameters in a He - N2/Ar magnetic pole enhanced inductive plasma source

    Science.gov (United States)

    Younus, Maria; Rehman, N. U.; Shafiq, M.; Zakaullah, M.; Abrar, M.

    2016-02-01

    A magnetic pole enhanced inductively coupled H e - N2/A r plasma is studied at low pressure, to monitor the effects of helium mixing on plasma parameters like electron number density (ne) , electron temperature (Te) , plasma potential (Vp ) , and electron energy probability functions (EEPFs). An RF compensated Langmuir probe is employed to measure these plasma parameters. It is noted that electron number density increases with increasing RF power and helium concentration in the mixture, while it decreases with increase in filling gas pressure. On the other hand, electron temperature shows an increasing trend with helium concentration in the mixture. At low RF powers and low helium concentration in the mixture, EEPFs show a "bi-Maxwellian" distribution with pressure. While at RF powers greater than 50 W and higher helium concentration in the mixture, EEPFs evolve into "Maxwellian" distribution. The variation of skin depth with RF power and helium concentration in the mixture, and its relation with EEPF are also studied. The effect of helium concentrations on the temperatures of two electron groups ( Tb u l k and Tt a i l ) in the "bi-Maxwellian" EEPFs is also observed. The temperature of low energy electron group ( Tb u l k) shows significant increase with helium addition, while the temperature of tail electrons ( Tt a i l) increases smoothly as compared to ( Tb u l k).

  7. Comparative evaluation of CVD diamond technologies

    Energy Technology Data Exchange (ETDEWEB)

    Anthony, T.R. [General Electric Corporate Research & Development Center, Schenectady, NY (United States)

    1993-01-01

    Chemical vapor deposition (CVD) of diamonds occurs from hydrogen-hydrocarbon gas mixtures in the presence of atomic hydrogen at subatmospheric pressures. Most CVD methods are based on different means of generating and transporting atomic hydrogen in a particular system. Evaluation of these different techniques involves their capital costs, material costs, energy costs, labor costs and the type and quality of diamond that they produce. Currently, there is no universal agreement on which is the best technique and technique selection has been largely driven by the professional background of the user as well as the particular application of interest. This article discusses the criteria for evaluating a process for low-pressure deposition of diamond. Next, a brief history of low-pressure diamond synthesis is reviewed. Several specific processes are addressed, including the hot filament process, hot filament electron-assisted chemical vapor deposition, and plasma generation of atomic hydrogen by glow discharge, microwave discharge, low pressure radio frequency discharge, high pressure DC discharge, high pressure microwave discharge jets, high pressure RF discharge, and high and low pressure flames. Other types of diamond deposition methods are also evaluated. 101 refs., 15 figs.

  8. Argan oil improves surrogate markers of CVD in humans.

    Science.gov (United States)

    Sour, Souad; Belarbi, Meriem; Khaldi, Darine; Benmansour, Nassima; Sari, Nassima; Nani, Abdelhafid; Chemat, Farid; Visioli, Francesco

    2012-06-01

    Limited - though increasing - evidence suggests that argan oil might be endowed with potential healthful properties, mostly in the areas of CVD and prostate cancer. We sought to comprehensively determine the effects of argan oil supplementation on the plasma lipid profile and antioxidant status of a group of healthy Algerian subjects, compared with matched controls. A total of twenty healthy subjects consumed 15 g/d of argan oil - with toasted bread - for breakfast, during 4 weeks (intervention group), whereas twenty matched controls followed their habitual diet, but did not consume argan oil. The study lasted 30 d. At the end of the study, argan oil-supplemented subjects exhibited higher plasma vitamin E concentrations, lower total and LDL-cholesterol, lower TAG and improved plasma and cellular antioxidant profile, when compared with controls. In conclusion, we showed that Algerian argan oil is able to positively modulate some surrogate markers of CVD, through mechanisms which warrant further investigation.

  9. Plasma-enhanced synthesis of green flame retardant cellulosic materials

    Science.gov (United States)

    Totolin, Vladimir

    The natural fiber-containing fabrics and composites are more environmentally friendly, and are used in transportation (automobiles, aerospace), military applications, construction industries (ceiling paneling, partition boards), consumer products, etc. Therefore, the flammability characteristics of the composites based on polymers and natural fibers play an important role. This dissertation presents the development of plasma assisted - green flame retardant coatings for cellulosic substrates. The overall objective of this work was to generate durable flame retardant treatment on cellulosic materials. In the first approach sodium silicate layers were pre-deposited onto clean cotton substrates and cross linked using low pressure, non-equilibrium oxygen plasma. A statistical design of experiments was used to optimize the plasma parameters. The modified cotton samples were tested for flammability using an automatic 45° angle flammability test chamber. Aging tests were conducted to evaluate the coating resistance during the accelerated laundry technique. The samples revealed a high flame retardant behavior and good thermal stability proved by thermo-gravimetric analysis. In the second approach flame retardant cellulosic materials have been produced using a silicon dioxide (SiO2) network coating. SiO 2 network armor was prepared through hydrolysis and condensation of the precursor tetraethyl orthosilicate (TEOS), prior coating the substrates, and was cross linked on the surface of the substrates using atmospheric pressure plasma (APP) technique. Due to protection effects of the SiO2 network armor, the cellulosic based fibers exhibit enhanced thermal properties and improved flame retardancy. In the third approach, the TEOS/APP treatments were extended to linen fabrics. The thermal analysis showed a higher char content and a strong endothermic process of the treated samples compared with control ones, indicating a good thermal stability. Also, the surface analysis proved

  10. Plasma enhanced diamond deposition on steel and Si substrates

    Institute of Scientific and Technical Information of China (English)

    Y.S. Li; Y. Tang; W. Chen; Q. Yang; C. Xiao; A. Hirose

    2009-01-01

    Diamond growth on Fe-Cr-Al-Si steel and Si substrates was comparatively investigated in microwave plasma enhanced chemical vapor deposition (MPCVD) reactor with different deposition parameters. Adherent nanocrystalline diamond films were directly deposited on this steel substrate under a typical deposition condition, whereas microcrystalline diamond films were produced on Si wafer. With increasing CH4 concentration, reaction pressure, or the total gas flow rate, the quality of nanocrystalline diamond films formed on Fe-Cr-Al-Si substrates is gradually deteriorated in terms of density and adhesion. This impaired diamond quality on steels is primarily associated with a combined effect by the substrate composition and the specific process conditions that favor excessive nucleation of diamond.

  11. Plasma-Sprayed Titanium Patterns for Enhancing Early Cell Responses

    Science.gov (United States)

    Shi, Yunqi; Xie, Youtao; Pan, Houhua; Zheng, Xuebin; Huang, Liping; Ji, Fang; Li, Kai

    2016-06-01

    Titanium coating has been widely used as a biocompatible metal in biomedical applications. However, the early cell responses and long-term fixation of titanium implants are not satisfied. To obviate these defects, in this paper, micro-post arrays with various widths (150-1000 μm) and intervals (100-300 μm) were fabricated on the titanium substrate by template-assisted plasma spraying technology. In vitro cell culture experiments showed that MC3T3-E1 cells exhibited significantly higher osteogenic differentiation as well as slightly improved adhesion and proliferation on the micro-patterned coatings compared with the traditional one. The cell number on the pattern with 1000 µm width reached 130% after 6 days of incubation, and the expressions of osteopontin (OPN) as well as osteocalcin (OC) were doubled. No obvious difference was found in cell adhesion on various size patterns. The present micro-patterned coatings proposed a new modification method for the traditional plasma spraying technology to enhance the early cell responses and convenience for the bone in-growth.

  12. Investigation on the priming effect of a CVD diamond microdosimeter

    Institute of Scientific and Technical Information of China (English)

    2002-01-01

    CVD diamond microdosimeter is an ideal substitute of common Si.GaAs detector for extremely strong radiation experimental environment due to its high band gap energy, fast charge collection, low dielectric constant and hardness. In order to improve its character, a CVD diamond microdosimeter was irradiated by a proton dose of 46 Gy, and a lateral micro-ion beam induced charge (IBIC) technique was utilized to characterize it in low beam current (~fA). It was clearly shown that charge collection efficiency and energy resolution were greatly improved after proton irradiation of that dose. Moreover, the homogeneities of both its counting performance and collection efficiency were enhanced. Proton irradiation of 46 Gy has been proved to be an effective way to prime a CVD diamond.

  13. Investigation on the priming effect of a CVD diamond microdosimeter

    CERN Document Server

    Lu Rong Rong; Jiang Da; Li Xiao Lin; Zhu Jie Qing

    2002-01-01

    CVD diamond microdosimeter is an ideal substitute of common Si, GaAs detector for extremely strong radiation experimental environmental due to its high band gap energy, fast charge collection, low dielectric constant and hardness. In order to improve its character, a CVD diamond microdosimeter was irradiated by a proton dose of 46 Gy, and a lateral micro-ion beam induced charge (IBIC) technique was utilized to characterize it in low beam current (approx fA). It was clearly shown that charge collection efficiency and energy resolution were greatly improved after proton irradiation of that dose. Moreover, the homogeneities of both its counting performance and collection efficiency were enhanced. Proton irradiation of 46 Gy has been proved to be an effective way to prime a CVD diamond

  14. Mechanism of Growth Enhancement of Plants Induced by Active Species in Plasmas

    Science.gov (United States)

    Watanabe, Satoshi; Ono, Reoto; Hayashi, Nobuya

    2015-09-01

    Plant growth enhances when seeds are irradiated by plasma. However the mechanism of the growth enhancement by plasma has not been clarified. In this study, growth enhancement of plants using various active species and variation of plant cells are investigated. RF plasma is generated under conditions where pressure is 60 Pa and input electrical power is 60 W. Irradiation period varies from 0 (control) to 75 min. Air plasma shows maximum growth of plants with irradiation period of 60 min on the other hand, oxygen plasma shows the maximum growth with irradiation period of 15 min. From change of gaseous species and pressure dependence, growth enhancing factor is expected to be active oxygen species produced in plasma. According to gene expression analysis of Arabidopsis, there are two speculated mechanism of plant growth enhancement. The first is acceleration of cell cycle by gene expressions of photosynthesis and glycolytic pathway, and the second is increase of cell size via plant hormone production.

  15. Enhanced Avalanche Ionization by RF Fields Creating an Ultracold Plasma

    Science.gov (United States)

    Robinson, M. P.; Gallagher, T. F.; Laburthe Tolra, B.; Pillet, P.

    2001-05-01

    Ultracold plasmas have been shown to evolve from initially frozen Rydberg gases held in magneto-optical traps.(M.P. Robinson, B. Laburthe Tolra, Michael W. Noel, T.F. Gallagher, and P. Pillet, Phys. Rev. Lett. 85), 4466 (2000) We report the enhancement of the avalanche ionization process by application of radiofrequency fields. An initial slow ionization rate is observed in the Rydberg sample due to black body ionization and ionizing collisions with hot Rydberg atoms. This produces an overall posititve space charge of cold ions as the hot electrons leave the sample. Once a threshold density of positive charges is built up, the hot electrons become trapped to the sample, leading to avalance ionization due to electron-Rydberg collisions. The mechanism of the ionization remains unclear. However, the application of radiofrequency fields, in the 1 V/cm, 100 MHz range, dramatically enhances the rate of avalanche ionization without changing the threshold density at which it occurs. Apparently, the limiting parameter is the rate of collisional ionization of Rydberg atoms by electrons.

  16. Growth Enhancement of Radish Sprouts Induced by Low Pressure O2 Radio Frequency Discharge Plasma Irradiation

    Science.gov (United States)

    Kitazaki, Satoshi; Koga, Kazunori; Shiratani, Masaharu; Hayashi, Nobuya

    2012-01-01

    We studied growth enhancement of radish sprouts (Raphanus sativus L.) induced by low pressure O2 radio frequency (RF) discharge plasma irradiation. The average length of radish sprouts cultivated for 7 days after O2 plasma irradiation is 30-60% greater than that without irradiation. O2 plasma irradiation does not affect seed germination. The experimental results reveal that oxygen related radicals strongly enhance growth, whereas ions and photons do not.

  17. CVD carbon powders modified by ball milling

    Directory of Open Access Journals (Sweden)

    Kazmierczak Tomasz

    2015-09-01

    Full Text Available Carbon powders produced using a plasma assisted chemical vapor deposition (CVD methods are an interesting subject of research. One of the most interesting methods of synthesizing these powders is using radio frequency plasma. This method, originally used in deposition of carbon films containing different sp2/sp3 ratios, also makes possible to produce carbon structures in the form of powder. Results of research related to the mechanical modification of these powders have been presented. The powders were modified using a planetary ball mill with varying parameters, such as milling speed, time, ball/powder mass ratio and additional liquids. Changes in morphology and particle sizes were measured using scanning electron microscopy and dynamic light scattering. Phase composition was analyzed using Raman spectroscopy. The influence of individual parameters on the modification outcome was estimated using statistical method. The research proved that the size of obtained powders is mostly influenced by the milling speed and the amount of balls. Powders tend to form conglomerates sized up to hundreds of micrometers. Additionally, it is possible to obtain nanopowders with the size around 100 nm. Furthermore, application of additional liquid, i.e. water in the process reduces the graphitization of the powder, which takes place during dry milling.

  18. Active screen plasma nitriding enhances cell attachment to polymer surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Kaklamani, Georgia, E-mail: g.kaklamani@bham.ac.uk [University of Birmingham, College of Engineering and Physical Sciences, School of Metallurgy and Materials, Edgbaston, Birmingham B15 2TT (United Kingdom); Bowen, James; Mehrban, Nazia [University of Birmingham, College of Engineering and Physical Sciences, School of Chemical Engineering, Edgbaston, Birmingham B15 2TT (United Kingdom); Dong, Hanshan [University of Birmingham, College of Engineering and Physical Sciences, School of Metallurgy and Materials, Edgbaston, Birmingham B15 2TT (United Kingdom); Grover, Liam M. [University of Birmingham, College of Engineering and Physical Sciences, School of Chemical Engineering, Edgbaston, Birmingham B15 2TT (United Kingdom); Stamboulis, Artemis [University of Birmingham, College of Engineering and Physical Sciences, School of Metallurgy and Materials, Edgbaston, Birmingham B15 2TT (United Kingdom)

    2013-05-15

    Active screen plasma nitriding (ASPN) is a well-established technique used for the surface modification of materials, the result of which is often a product with enhanced functional performance. Here we report the modification of the chemical and mechanical properties of ultra-high molecular weight poly(ethylene) (UHMWPE) using 80:20 (v/v) N{sub 2}/H{sub 2} ASPN, followed by growth of 3T3 fibroblasts on the treated and untreated polymer surfaces. ASPN-treated UHMWPE showed extensive fibroblast attachment within 3 h of seeding, whereas fibroblasts did not successfully attach to untreated UHMWPE. Fibroblast-coated surfaces were maintained for up to 28 days, monitoring their metabolic activity and morphology throughout. The chemical properties of the ASPN-treated UHMWPE surface were studied using X-ray photoelectron spectroscopy, revealing the presence of C-N, C=N, and C≡N chemical bonds. The elastic modulus, surface topography, and adhesion properties of the ASPN-treated UHMWPE surface were studied over 28 days during sample storage under ambient conditions and during immersion in two commonly used cell culture media.

  19. Enhanced conductivity of aluminum doped ZnO films by hydrogen plasma treatment

    Energy Technology Data Exchange (ETDEWEB)

    Chang, H.P. [Department of Electrical Engineering and Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 402, Taiwan (China); Wang, F.H., E-mail: fansen@dragon.nchu.edu.t [Department of Electrical Engineering and Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 402, Taiwan (China); Wu, J.Y.; Kung, C.Y.; Liu, H.W. [Department of Electrical Engineering and Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 402, Taiwan (China)

    2010-10-01

    Aluminum doped zinc oxide (AZO) thin films prepared by radio-frequency (RF) magnetron sputtering at various RF power were treated by hydrogen plasma to enhance the characteristics for transparent electrode applications. The hydrogen plasma treatment was carried out at 300 {sup o}C in a plasma enhanced chemical vapor deposition system. X-ray diffraction analysis shows that all AZO films have a (002) preferred orientation and film crystallinity seems no significant change after plasma treatment. The plasma treatment not only significantly decreases film resistivity but enhances electrical stability as aging in air ambient. The improved electrical properties are due to desorption of weakly bonded oxygen species, formation of Zn-H type species and passivation of deep-level defects during plasma treatment.

  20. Plasma Surface Modification of Glass-Fibre-Reinforced Polyester Enhanced by Ultrasonic Irradiation

    DEFF Research Database (Denmark)

    Kusano, Yukihiro; Singh, Shailendra Vikram; Bardenshtein, Alexander

    2010-01-01

    .295, 0.385 and 0.447, respectively. This indicated that the plasma treatment oxidized and roughened the GFRP surface, and the ultrasonic irradiation further enhanced the oxidation. It is concluded that plasma treatment efficiency for adhesion improvement of GFRPs is enhanced by the ultrasonic irradiation.......During atmospheric pressure plasma treatment, reactive species generated in the plasma diffuse through a boundary gas layer which is adsorbed at the material surface. Many of the reactive species become inactivated before reaching the surface due to their short lifetime. The efficiency of plasma....... The surface characterizations were performed using contact angle measurements, X-ray photoelectron spectroscopy (XPS) and atomic force mictroscopy (AFM). O/C ratios at the GFRP surfaces before the treatments, after 30-s plasma treatment, and after 30-s plasma treatment with ultrasonic irradiation were 0...

  1. Plasma enhanced C1 chemistry for green technology

    Science.gov (United States)

    Nozaki, Tomohiro

    2013-09-01

    Plasma catalysis is one of the innovative next generation green technologies that meet the needs for energy and materials conservation as well as environmental protection. Non-thermal plasma uniquely generates reactive species independently of reaction temperature, and these species are used to initiate chemical reactions at unexpectedly lower temperatures than normal thermochemical reactions. Non-thermal plasma thus broadens the operation window of existing chemical conversion processes, and ultimately allows modification of the process parameters to minimize energy and material consumption. We have been specifically focusing on dielectric barrier discharge (DBD) as one of the viable non-thermal plasma sources for practical fuel reforming. In the presentation, room temperature one-step conversion of methane to methanol and hydrogen using a miniaturized DBD reactor (microplasma reactor) is highlighted. The practical impact of plasma technology on existing C1-chemistry is introduced, and then unique characteristics of plasma fuel reforming such as non-equilibrium product distribution is discussed.

  2. Post-Plasma SiOx Coatings of Metal and Metal Oxide Nanoparticles for Enhanced Thermal Stability and Tunable Photoactivity Applications

    Directory of Open Access Journals (Sweden)

    Patrick Post

    2016-05-01

    Full Text Available The plasma-based aerosol process developed for the direct coating of particles in gases with silicon oxide in a continuous chemical vapor deposition (CVD process is presented. It is shown that non-thermal plasma filaments induced in a dielectric barrier discharge (DBD at atmospheric pressure trigger post-DBD gas phase reactions. DBD operating conditions are first scanned to produce ozone and dinitrogen pentoxide. In the selected conditions, these plasma species react with gaseous tetraethyl orthosilicate (TEOS precursor downstream of the DBD. The gaseous intermediates then condense on the surface of nanoparticles and self-reactions lead to homogeneous solid SiOx coatings, with thickness from nanometer to micrometer. This confirms the interest of post-DBD injection of the organo-silicon precursor to achieve stable production of actives species with subsequent controlled thickness of SiOx coatings. SiOx coatings of spherical and agglomerated metal and metal oxide nanoparticles (Pt, CuO, TiO2 are achieved. In the selected DBD operating conditions, the thickness of homogeneous nanometer sized coatings of spherical nanoparticles depends on the reaction duration and on the precursor concentration. For agglomerates, operating conditions can be tuned to cover preferentially the interparticle contact zones between primary particles, shifting the sintering of platinum agglomerates to much higher temperatures than the usual sintering temperature. Potential applications for enhanced thermal stability and tunable photoactivity of coated agglomerates are presented.

  3. Post-Plasma SiOx Coatings of Metal and Metal Oxide Nanoparticles for Enhanced Thermal Stability and Tunable Photoactivity Applications.

    Science.gov (United States)

    Post, Patrick; Jidenko, Nicolas; Weber, Alfred P; Borra, Jean-Pascal

    2016-05-13

    The plasma-based aerosol process developed for the direct coating of particles in gases with silicon oxide in a continuous chemical vapor deposition (CVD) process is presented. It is shown that non-thermal plasma filaments induced in a dielectric barrier discharge (DBD) at atmospheric pressure trigger post-DBD gas phase reactions. DBD operating conditions are first scanned to produce ozone and dinitrogen pentoxide. In the selected conditions, these plasma species react with gaseous tetraethyl orthosilicate (TEOS) precursor downstream of the DBD. The gaseous intermediates then condense on the surface of nanoparticles and self-reactions lead to homogeneous solid SiOx coatings, with thickness from nanometer to micrometer. This confirms the interest of post-DBD injection of the organo-silicon precursor to achieve stable production of actives species with subsequent controlled thickness of SiOx coatings. SiOx coatings of spherical and agglomerated metal and metal oxide nanoparticles (Pt, CuO, TiO₂) are achieved. In the selected DBD operating conditions, the thickness of homogeneous nanometer sized coatings of spherical nanoparticles depends on the reaction duration and on the precursor concentration. For agglomerates, operating conditions can be tuned to cover preferentially the interparticle contact zones between primary particles, shifting the sintering of platinum agglomerates to much higher temperatures than the usual sintering temperature. Potential applications for enhanced thermal stability and tunable photoactivity of coated agglomerates are presented.

  4. Enhancement of electrical properties of polyimide films by plasma treatment

    Science.gov (United States)

    Meddeb, A. Barhoumi; Ounaies, Z.; Lanagan, M.

    2016-04-01

    In this study, the effect of oxygen plasma treatment on the electrical and surface properties of polyimide, Kapton HN, film is investigated. The plasma treatment led to an increase in the oxygen presence on the polyimide surface and a marked surface hydrophilicity. The plasma treatment led to an increase in the dielectric breakdown and Weibull modulus as well as a remarkable reduction in the scatter of all electrical measurements. There is a significant reduction in the high field/high temperature leakage current after plasma treatment. These findings have important implications in the development and improvement of dielectric polymer capacitors.

  5. Single liquid-source plasma enhanced metalorganic chemical vapor deposition of YBa sub 2 Cu sub 3 O sub 7-x thin films. Technical report

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, J.; Gardiner, R.; Kirlin, P.S.; Boerstler, R.W.; Steinbeck, J.

    1992-07-29

    High quality YBa2Cu3O7-x films were grown in-situ on LaAlO3 (100) by a novel single liquid source plasma-enhanced metalorganic chemical vapor deposition process. The metalorganic complexes M(thd)n, (thd = 2,2,6,6-tetramethyl-3,5-heptanedionate; M = Y, Ba, Cu) were dissolved in an organic solution and injected into a vaporizer immediately upstream of the reactor inlet The single liquid source technique dramatically simplifies current CVD processing and can significantly improve the process reproducibility. X-ray diffraction. measurements indicated that single phase, highly c-axis oriented YBa2Cu3O7-x was formed in-situ at a substrate temperature 680 degC. The as-deposited films exhibited a mirror-like surface, had transition temperature Tc = 89 K, Delta Tc < 1K, and Jc(77K) = 106 A/cm2. Plasma enhanced metalorganic chemical vapor deposition, YBCO, superconductors.

  6. Plasma enhanced vortex fluidic device manipulation of graphene oxide.

    Science.gov (United States)

    Jones, Darryl B; Chen, Xianjue; Sibley, Alexander; Quinton, Jamie S; Shearer, Cameron J; Gibson, Christopher T; Raston, Colin L

    2016-08-25

    A vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma-liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.

  7. FTIR monitoring of industrial scale CVD processes

    Science.gov (United States)

    Hopfe, V.; Mosebach, H.; Meyer, M.; Sheel, D.; Grählert, W.; Throl, O.; Dresler, B.

    1998-06-01

    The goal is to improve chemical vapour deposition (CVD) and infiltration (CVI) process control by a multipurpose, knowledge based feedback system. For monitoring the CVD/CVI process in-situ FTIR spectroscopic data has been identified as input information. In the presentation, three commonly used, and distinctly different, types of industrial CVD/CVI processes are taken as test cases: (i) a thermal high capacity CVI batch process for manufacturing carbon fibre reinforced SiC composites for high temperature applications, (ii) a continuously driven CVD thermal process for coating float glass for energy protection, and (iii) a laser stimulated CVD process for continuously coating bundles of thin ceramic fibers. The feasibility of the concept with FTIR in-situ monitoring as a core technology has been demonstrated. FTIR monitoring sensibly reflects process conditions.

  8. Skeletal cell differentiation is enhanced by atmospheric dielectric barrier discharge plasma treatment.

    Directory of Open Access Journals (Sweden)

    Marla J Steinbeck

    Full Text Available Enhancing chondrogenic and osteogenic differentiation is of paramount importance in providing effective regenerative therapies and improving the rate of fracture healing. This study investigated the potential of non-thermal atmospheric dielectric barrier discharge plasma (NT-plasma to enhance chondrocyte and osteoblast proliferation and differentiation. Although the exact mechanism by which NT-plasma interacts with cells is undefined, it is known that during treatment the atmosphere is ionized generating extracellular reactive oxygen and nitrogen species (ROS and RNS and an electric field. Appropriate NT-plasma conditions were determined using lactate-dehydrogenase release, flow cytometric live/dead assay, flow cytometric cell cycle analysis, and Western blots to evaluate DNA damage and mitochondrial integrity. We observed that specific NT-plasma conditions were required to prevent cell death, and that loss of pre-osteoblastic cell viability was dependent on intracellular ROS and RNS production. To further investigate the involvement of intracellular ROS, fluorescent intracellular dyes Mitosox (superoxide and dihydrorhodamine (peroxide were used to assess onset and duration after NT-plasma treatment. Both intracellular superoxide and peroxide were found to increase immediately post NT-plasma treatment. These increases were sustained for one hour but returned to control levels by 24 hr. Using the same treatment conditions, osteogenic differentiation by NT-plasma was assessed and compared to peroxide or osteogenic media containing β-glycerolphosphate. Although both NT-plasma and peroxide induced differentiation-specific gene expression, neither was as effective as the osteogenic media. However, treatment of cells with NT-plasma after 24 hr in osteogenic or chondrogenic media significantly enhanced differentiation as compared to differentiation media alone. The results of this study show that NT-plasma can selectively initiate and amplify ROS

  9. Skeletal cell differentiation is enhanced by atmospheric dielectric barrier discharge plasma treatment.

    Science.gov (United States)

    Steinbeck, Marla J; Chernets, Natalie; Zhang, Jun; Kurpad, Deepa S; Fridman, Gregory; Fridman, Alexander; Freeman, Theresa A

    2013-01-01

    Enhancing chondrogenic and osteogenic differentiation is of paramount importance in providing effective regenerative therapies and improving the rate of fracture healing. This study investigated the potential of non-thermal atmospheric dielectric barrier discharge plasma (NT-plasma) to enhance chondrocyte and osteoblast proliferation and differentiation. Although the exact mechanism by which NT-plasma interacts with cells is undefined, it is known that during treatment the atmosphere is ionized generating extracellular reactive oxygen and nitrogen species (ROS and RNS) and an electric field. Appropriate NT-plasma conditions were determined using lactate-dehydrogenase release, flow cytometric live/dead assay, flow cytometric cell cycle analysis, and Western blots to evaluate DNA damage and mitochondrial integrity. We observed that specific NT-plasma conditions were required to prevent cell death, and that loss of pre-osteoblastic cell viability was dependent on intracellular ROS and RNS production. To further investigate the involvement of intracellular ROS, fluorescent intracellular dyes Mitosox (superoxide) and dihydrorhodamine (peroxide) were used to assess onset and duration after NT-plasma treatment. Both intracellular superoxide and peroxide were found to increase immediately post NT-plasma treatment. These increases were sustained for one hour but returned to control levels by 24 hr. Using the same treatment conditions, osteogenic differentiation by NT-plasma was assessed and compared to peroxide or osteogenic media containing β-glycerolphosphate. Although both NT-plasma and peroxide induced differentiation-specific gene expression, neither was as effective as the osteogenic media. However, treatment of cells with NT-plasma after 24 hr in osteogenic or chondrogenic media significantly enhanced differentiation as compared to differentiation media alone. The results of this study show that NT-plasma can selectively initiate and amplify ROS signaling to enhance

  10. Carbon nanofiber growth in plasma-enhanced chemical vapor deposition

    Science.gov (United States)

    Denysenko, I.; Ostrikov, K.; Cvelbar, U.; Mozetic, M.; Azarenkov, N. A.

    2008-10-01

    A theoretical model to describe the plasma-assisted growth of carbon nanofibers (CNFs) is proposed. Using the model, the plasma-related effects on the nanofiber growth parameters, such as the growth rate due to surface and bulk diffusion, the effective carbon flux to the catalyst surface, the characteristic residence time and diffusion length of carbon atoms on the catalyst surface, and the surface coverages, have been studied. The dependence of these parameters on the catalyst surface temperature and ion and etching gas fluxes to the catalyst surface is quantified. The optimum conditions under which a low-temperature plasma environment can benefit the CNF growth are formulated. These results are in good agreement with the available experimental data on CNF growth and can be used for optimizing synthesis of related nanoassemblies in low-temperature plasma-assisted nanofabrication.

  11. Plasma-induced polymerization for enhancing paper hydrophobicity.

    Science.gov (United States)

    Song, Zhaoping; Tang, Jiebin; Li, Junrong; Xiao, Huining

    2013-01-30

    Hydrophobic modification of cellulose fibers was conducted via plasma-induced polymerization in an attempt to graft the hydrophobic polymer chains on paper surface, this increasing the hydrophobicity of paper. Two hydrophobic monomers, butyl acrylate (BA) and 2-ethylhexyl acrylate (2-EHA), were grafted on cellulose fibers, induced by atmospheric cold plasma. Various influencing factors associated with the plasma-induced grafting were investigated. Contact-angle measurement, Fourier Transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and scanning electron microscope (SEM) were used to ascertain the occurrence of the grafting and characterized the changes of the cellulose fiber after modification. The results showed that the hydrophobicity of the modified paper sheet was improved significantly after the plasma-induced grafting. The water contact angle on the paper surface reached up to 130°. The morphological differences between modified and unmodified samples were also revealed by SEM observation. The resulting paper is promising as a green-based packaging material.

  12. Plasma Treatment to Enhance Fuel Cell Water Management Project

    Data.gov (United States)

    National Aeronautics and Space Administration — The objective of this proposal is to further define the potential for plasma treatment technology, developed by the NASA Glenn Research Center (GRC) to modify and...

  13. Characterization of amorphous hydrogenated carbon formed by low-pressure inductively coupled plasma enhanced chemical vapor deposition using multiple low-inductance antenna units.

    Science.gov (United States)

    Tsuda, Osamu; Ishihara, Masatou; Koga, Yoshinori; Fujiwara, Shuzo; Setsuhara, Yuichi; Sato, Naoyuki

    2005-03-24

    Three-dimensional plasma enhanced chemical vapor deposition (CVD) of hydrogenated amorphous carbon (a-C:H) has been demonstrated using a new type high-density volumetric plasma source with multiple low-inductance antenna system. The plasma density in the volume of phi 200 mm x 100 mm is 5.1 x 10(10) cm(-3) within +/-5% in the lateral directions and 5.2 x 10(10)cm(-3) within +/-10% in the axial direction for argon plasma under the pressure of 0.1 Pa and the total power as low as 400 W. The uniformity of the thickness and refractive index is within +/-3.5% and +/-1%, respectively, for the a-C:H films deposited on the substrates placed on the six side walls, the top of the phi 60 mm x 80 mm hexagonal substrate holder in the pure toluene plasma under the pressure is as low as 0.04 Pa, and the total power is as low as 300 W. It is also found that precisely controlled ion bombardment by pulse biasing led to the explicit observation in Raman and IR spectra of the transition from polymer-like structure to diamond-like structure accompanied by dehydrogenation due to ion bombardment. Moreover, it is also concluded that the pulse biasing technique is effective for stress reduction without a significant degradation of hardness. The stress of 0.6 GPa and the hardness of 15 GPa have been obtained for 2.0 microm thick films deposited with the optimized deposition conditions. The films are durable for the tribology test with a high load of 20 N up to more than 20,000 cycles, showing the specific wear rate and the friction coefficient were 1.2 x 10(-7) mm3/Nm and 0.04, respectively.

  14. Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses

    NARCIS (Netherlands)

    Dingemans, G.; M. C. M. van de Sanden,; Kessels, W. M. M.

    2012-01-01

    An alternative plasma-enhanced chemical vapor deposition (PECVD) method is developed and applied for the deposition of high-quality aluminum oxide (AlOx) films. The PECVD method combines a continuous plasma with ultrashort precursor injection pulses. We demonstrate that the modulation of the precurs

  15. A mathematical model and simulation results of plasma enhanced chemical vapor deposition of silicon nitride films

    NARCIS (Netherlands)

    Konakov, S.A.; Krzhizhanovskaya, V.V.

    2015-01-01

    We developed a mathematical model of Plasma Enhanced Chemical Vapor Deposition (PECVD) of silicon nitride thin films from SiH4-NH3-N2-Ar mixture, an important application in modern materials science. Our multiphysics model describes gas dynamics, chemical physics, plasma physics and electrodynamics.

  16. Plasma-enhanced microwave solid-state synthesis of cadmium sulfide: reaction mechanism and optical properties.

    Science.gov (United States)

    Du, Ke-zhao; Chaturvedi, Apoorva; Wang, Xing-zhi; Zhao, Yi; Zhang, Ke-ke; Iqbal Bakti Utama, M; Hu, Peng; Jiang, Hui; Xiong, Qi-hua; Kloc, Christian

    2015-08-14

    CdS synthesis by plasma-enhanced microwave physical vapor transport (PMPVT) has been developed in this work. The photoluminescence (PL), absorbance, Raman spectra and the mechanism of CdS crystal growth have been investigated. Furthermore, plasma-enhanced microwave chemical vapour transport (PMCVT) synthesis of CdS with additional chemical transport agents has been explored. In addition, other II-VI chalcogenides were also synthesized by PMPVT.

  17. Enhanced photon emission and pair production in laser-irradiated plasmas

    Science.gov (United States)

    Wan, Feng; Lv, Chong; Jia, Moran; Xie, Baisong

    2017-07-01

    Enhanced photon emission and pair production due to heavy ion mass in the interaction of an ultraintense laser with overdense plasmas is explored by particle-in-cell simulation. It is found that plasmas with heavier ion mass can excite a higher and broader electrostatic field, which causes the enhancement of backward photon emission. The pair yields are then enhanced due to the increase of backwards photons colliding with the incoming laser pulse. By examining the density evolution and angle distribution of each particle species, the origin of pair yield enhancement is clarified.

  18. Diagnostic for Plasma Enhanced Chemical Vapor Deposition and Etch Systems

    Science.gov (United States)

    Cappelli, Mark A.

    1999-01-01

    In order to meet NASA's requirements for the rapid development and validation of future generation electronic devices as well as associated materials and processes, enabling technologies ion the processing of semiconductor materials arising from understanding etch chemistries are being developed through a research collaboration between Stanford University and NASA-Ames Research Center, Although a great deal of laboratory-scale research has been performed on many of materials processing plasmas, little is known about the gas-phase and surface chemical reactions that are critical in many etch and deposition processes, and how these reactions are influenced by the variation in operating conditions. In addition, many plasma-based processes suffer from stability and reliability problems leading to a compromise in performance and a potentially increased cost for the semiconductor manufacturing industry. Such a lack of understanding has hindered the development of process models that can aid in the scaling and improvement of plasma etch and deposition systems. The research described involves the study of plasmas used in semiconductor processes. An inductively coupled plasma (ICP) source in place of the standard upper electrode assembly of the Gaseous Electronics Conference (GEC) radio-frequency (RF) Reference Cell is used to investigate the discharge characteristics and chemistries. This ICP source generates plasmas with higher electron densities (approximately 10(exp 12)/cu cm) and lower operating pressures (approximately 7 mTorr) than obtainable with the original parallel-plate version of the GEC Cell. This expanded operating regime is more relevant to new generations of industrial plasma systems being used by the microelectronics industry. The motivation for this study is to develop an understanding of the physical phenomena involved in plasma processing and to measure much needed fundamental parameters, such as gas-phase and surface reaction rates. species

  19. Plasmas in Multiphase Media: Bubble Enhanced Discharges in Liquids and Plasma/Liquid Phase Boundaries

    Energy Technology Data Exchange (ETDEWEB)

    Kushner, Mark Jay [University of Michigan

    2014-07-10

    In this research project, the interaction of atmospheric pressure plasmas with multi-phase media was computationally investigated. Multi-phase media includes liquids, particles, complex materials and porous surfaces. Although this investigation addressed fundamental plasma transport and chemical processes, the outcomes directly and beneficially affected applications including biotechnology, medicine and environmental remediation (e.g., water purification). During this project, we made advances in our understanding of the interaction of atmospheric pressure plasmas in the form of dielectric barrier discharges and plasma jets with organic materials and liquids. We also made advances in our ability to use computer modeling to represent these complex processes. We determined the method that atmospheric pressure plasmas flow along solid and liquid surfaces, and through endoscopic like tubes, deliver optical and high energy ion activation energy to organic and liquid surfaces, and produce reactivity in thin liquid layers, as might cover a wound. We determined the mechanisms whereby plasmas can deliver activation energy to the inside of liquids by sustaining plasmas in bubbles. These findings are important to the advancement of new technology areas such as plasma medicine

  20. An enhancement of plasma density by neutral gas injection observed in SEPAC Spacelab-1 experiment

    Science.gov (United States)

    Sasaki, S.; Kawashima, N.; Kuriki, K.; Yanagisawa, M.; Obayashi, T.; Kubota, S.; Roberts, W. T.; Reasoner, D. L.; Taylor, W. W. L.; Williamson, P. R.

    1985-01-01

    An enhancement of plasma density observed during a neutral gas injection in Space Experiments with Particle Accelerators by the Space Shuttle/Spacelab-1 is presented. When a plume of nitrogen gas was injected from the orbiter into space, a large amount of plasma was detected by an onboard plasma probe. The observed density often increased beyond the background plasma density and was strongly dependent on the attitude of the orbiter with respect to the velocity vector. This effect has been explained by a collisional interaction between the injected gas molecules and the ionospheric ions relatively drifting at the orbital speed.

  1. Enhanced acceleration of injected electrons in a laser-beat-wave-induced plasma channel.

    Science.gov (United States)

    Tochitsky, S Ya; Narang, R; Filip, C V; Musumeci, P; Clayton, C E; Yoder, R B; Marsh, K A; Rosenzweig, J B; Pellegrini, C; Joshi, C

    2004-03-05

    Enhanced energy gain of externally injected electrons by a approximately 3 cm long, high-gradient relativistic plasma wave (RPW) is demonstrated. Using a CO2 laser beat wave of duration longer than the ion motion time across the laser spot size, a laser self-guiding process is initiated in a plasma channel. Guiding compensates for ionization-induced defocusing (IID) creating a longer plasma, which extends the interaction length between electrons and the RPW. In contrast to a maximum energy gain of 10 MeV when IID is dominant, the electrons gain up to 38 MeV energy in a laser-beat-wave-induced plasma channel.

  2. Atmospheric pressure plasma enhanced spatial ALD of silver

    NARCIS (Netherlands)

    Van Den Bruele, F.J.; Smets, M.; Illiberi, A.; Creyghton, Y.; Buskens, P.; Roozeboom, F.; Poodt, P.

    2014-01-01

    The authors have investigated the growth of thin silver films using a unique combination of atmospheric process elements: spatial atomic layer deposition and an atmospheric pressure surface dielectric barrier discharge plasma source. Silver films were grown on top of Si substrates with good purity a

  3. Plasma processing of fibre materials for enhanced impact protection

    NARCIS (Netherlands)

    Creyghton, Y.L.M.; Simor, M.

    2009-01-01

    The performance of lightweight impact protective clothing depends on the constituting materials, their assembly in a system and interaction under various dynamic impact conditions. In this paper an overview of options for improved impact protective clothing systems based on a new plasma technology i

  4. Atmospheric pressure plasma enhanced spatial ALD of silver

    NARCIS (Netherlands)

    Van Den Bruele, F.J.; Smets, M.; Illiberi, A.; Creyghton, Y.; Buskens, P.; Roozeboom, F.; Poodt, P.

    2014-01-01

    The authors have investigated the growth of thin silver films using a unique combination of atmospheric process elements: spatial atomic layer deposition and an atmospheric pressure surface dielectric barrier discharge plasma source. Silver films were grown on top of Si substrates with good purity a

  5. Plasma processing of fibre materials for enhanced impact protection

    NARCIS (Netherlands)

    Creyghton, Y.L.M.; Simor, M.

    2009-01-01

    The performance of lightweight impact protective clothing depends on the constituting materials, their assembly in a system and interaction under various dynamic impact conditions. In this paper an overview of options for improved impact protective clothing systems based on a new plasma technology i

  6. Plasma processing of fibre materials for enhanced impact protection

    NARCIS (Netherlands)

    Creyghton, Y.L.M.; Simor, M.

    2009-01-01

    The performance of lightweight impact protective clothing depends on the constituting materials, their assembly in a system and interaction under various dynamic impact conditions. In this paper an overview of options for improved impact protective clothing systems based on a new plasma technology

  7. Ultratough CVD single crystal diamond and three dimensional growth thereof

    Science.gov (United States)

    Hemley, Russell J [Washington, DC; Mao, Ho-kwang [Washington, DC; Yan, Chih-shiue [Washington, DC

    2009-09-29

    The invention relates to a single-crystal diamond grown by microwave plasma chemical vapor deposition that has a toughness of at least about 30 MPa m.sup.1/2. The invention also relates to a method of producing a single-crystal diamond with a toughness of at least about 30 MPa m.sup.1/2. The invention further relates to a process for producing a single crystal CVD diamond in three dimensions on a single crystal diamond substrate.

  8. Fracture Characteristics of Monolayer CVD-Graphene

    Science.gov (United States)

    Hwangbo, Yun; Lee, Choong-Kwang; Kim, Sang-Min; Kim, Jae-Hyun; Kim, Kwang-Seop; Jang, Bongkyun; Lee, Hak-Joo; Lee, Seoung-Ki; Kim, Seong-Su; Ahn, Jong-Hyun; Lee, Seung-Mo

    2014-03-01

    We have observed and analyzed the fracture characteristics of the monolayer CVD-graphene using pressure bulge testing setup. The monolayer CVD-graphene has appeared to undergo environmentally assisted subcritical crack growth in room condition, i.e. stress corrosion cracking arising from the adsorption of water vapor on the graphene and the subsequent chemical reactions. The crack propagation in graphene has appeared to be able to be reasonably tamed by adjusting applied humidity and stress. The fracture toughness, describing the ability of a material containing inherent flaws to resist catastrophic failure, of the CVD-graphene has turned out to be exceptionally high, as compared to other carbon based 3D materials. These results imply that the CVD-graphene could be an ideal candidate as a structural material notwithstanding environmental susceptibility. In addition, the measurements reported here suggest that specific non-continuum fracture behaviors occurring in 2D monoatomic structures can be macroscopically well visualized and characterized.

  9. Fracture Characteristics of Monolayer CVD-Graphene

    OpenAIRE

    Hwangbo, Yun; Lee, Choong-Kwang; Kim, Sang-Min; Kim, Jae-Hyun; Kim, Kwang-Seop; Jang, Bongkyun; Lee, Hak-Joo; Lee, Seoung-Ki; Kim, Seong-Su; Ahn, Jong-Hyun; Lee, Seung-Mo

    2014-01-01

    We have observed and analyzed the fracture characteristics of the monolayer CVD-graphene using pressure bulge testing setup. The monolayer CVD-graphene has appeared to undergo environmentally assisted subcritical crack growth in room condition, i.e. stress corrosion cracking arising from the adsorption of water vapor on the graphene and the subsequent chemical reactions. The crack propagation in graphene has appeared to be able to be reasonably tamed by adjusting applied humidity and stress. ...

  10. Enhanced biocompatibility of TiO2 surfaces by highly reactive plasma

    Science.gov (United States)

    Junkar, Ita; Kulkarni, Mukta; Drašler, Barbara; Rugelj, Neža; Recek, Nina; Drobne, Damjana; Kovač, Janez; Humpolicek, Petr; Iglič, Aleš; Mozetič, Miran

    2016-06-01

    In the present study the biological response to various nanotopographic features after gaseous plasma treatment were studied. The usefulness of nanostructured surfaces for implantable materials has already been acknowledged, while less is known on the combined effect of nanostructured plasma modified surfaces. In the present work the influence of oxygen plasma treatment on nanostructured titanium oxide (TiO2) surfaces was studied. Characterization of the TiO2 surface chemical composition and morphological features was analyzed after plasma modification by x-ray photoelectron spectroscopy and by scanning electron microscopy while surface wettability was studied with measuring the water contact angle. Cell adhesion and morphology was assessed from images taken with scanning electron microscopy, whereas cell viability was measured with a calorimetric assay. The obtained results showed that oxygen plasma treatment of TiO2 nanotube surfaces significantly influences the adhesion and morphology of osteoblast-like cells in comparison to untreated nanostructured surfaces. Marked changes in surface composition of plasma treated surfaces were observed, as plasma treatment removed hydrocarbon contamination and removed fluorine impurities, which were present due to the electrochemical anodization process. However no differences in wettability of untreated and plasma treated surfaces were noticed. Treatment with oxygen plasma stimulated osteoblast-like cell adhesion and spreading on the nanostructured surface, suggesting the possible use of oxygen plasma surface treatment to enhance osteoblast-like cell response.

  11. Plasma-enhanced mixing and flameholding in supersonic flow

    Science.gov (United States)

    Firsov, Alexander; Savelkin, Konstantin V.; Yarantsev, Dmitry A.; Leonov, Sergey B.

    2015-01-01

    The results of experimental study of plasma-based mixing, ignition and flameholding in a supersonic model combustor are presented in the paper. The model combustor has a length of 600 mm and cross section of 72 mm width and 60 mm height. The fuel is directly injected into supersonic airflow (Mach number M=2, static pressure Pst=160–250 Torr) through wall orifices. Two series of tests are focused on flameholding and mixing correspondingly. In the first series, the near-surface quasi-DC electrical discharge is generated by flush-mounted electrodes at electrical power deposition of Wpl=3–24 kW. The scope includes parametric study of ignition and flame front dynamics, and comparison of three schemes of plasma generation: the first and the second layouts examine the location of plasma generators upstream and downstream from the fuel injectors. The third pattern follows a novel approach of combined mixing/ignition technique, where the electrical discharge distributes along the fuel jet. The last pattern demonstrates a significant advantage in terms of flameholding limit. In the second series of tests, a long discharge of submicrosecond duration is generated across the flow and along the fuel jet. A gasdynamic instability of thermal cavity developed after a deposition of high-power density in a thin plasma filament promotes the air–fuel mixing. The technique studied in this work has weighty potential for high-speed combustion applications, including cold start/restart of scramjet engines and support of transition regime in dual-mode scramjet and at off-design operation. PMID:26170434

  12. Enhanced Plasma Confinement in a Magnetic Well by Whistler Waves

    DEFF Research Database (Denmark)

    Balmashnov, A. A.; Juul Rasmussen, Jens

    1981-01-01

    The propagation of whistler waves in a magnetic field of mirror configuration is investigated experimentally. The strong interaction between waves and particles at the electron-cyclotron resonance leads to enhanced confinement in the magnetic well.......The propagation of whistler waves in a magnetic field of mirror configuration is investigated experimentally. The strong interaction between waves and particles at the electron-cyclotron resonance leads to enhanced confinement in the magnetic well....

  13. Plasma-polymerized thiophene films for enhanced rubber steel bonding

    Science.gov (United States)

    Delattre, James L.; d'Agostino, Riccardo; Fracassi, Francesco

    2006-03-01

    Thin films of plasma-polymerized thiophene (PPTh) were deposited on cold-rolled steel substrates to improve adhesion to rubber compounds. PPTh films were characterized by X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy (FT-IR) and atomic force microscopy. The ratio of carbon-to-sulfur found in PPTh films is 4:1, suggesting the monomer structure is generally intact, which was supported by FT-IR absorptions characteristic of polymerized thiophene rings. However, some fragmentation did occur to give acetylenic and aliphatic groups. Steel-rubber adhesion measurements, performed in accordance with the ASTM 429-B peel test, strongly depended on cleaning and pretreatment methods as well as film thickness. Best results were obtained on polished steel samples that were cleaned with acid, pretreated with a hydrogen/argon plasma, then coated with 50 Å of PPTh film. These samples exhibited a peel force of 14.3 N/mm, which is comparable to that of polished brass control samples. Depth-profiling XPS analysis of the rubber-steel interface showed the existence of an iron sulfide layer which is likely responsible for the strong adhesion.

  14. Simulation of low-temperature, atmospheric-pressure plasma enhanced chemical vapor deposition reactors

    OpenAIRE

    Lorant, Christophe; Descamps, Pierre; De Wilde, Juray; 1st BeLux workshop on “Coating, Materials, surfaces and Interfaces

    2014-01-01

    The simulation of low-temperature, atmospheric-pressure plasma enhanced chemical vapor deposition reactors is challenging due to the coupling of the fluid dynamics, the chemical reactions and the electric field and the stiffness of the resulting mathematical system. The model equations and the rigorous model reduction to reduce the stiffness are addressed in this paper. Considering pure nitrogen plasma, simulations with two configurations are discussed.

  15. Oxygen Barrier Coating Deposited by Novel Plasma-enhanced Chemical Vapor Deposition

    DEFF Research Database (Denmark)

    Jiang, Juan; Benter, M.; Taboryski, Rafael Jozef

    2010-01-01

    We report the use of a novel plasma-enhanced chemical vapor deposition chamber with coaxial electrode geometry for the SiOx deposition. This novel plasma setup exploits the diffusion of electrons through the inner most electrode to the interior samples space as the major energy source. This confi......, and it increased the barrier property of the modified low-density polyethylene, polyethylene terephthalate, and polylactide by 96.48%, 99.69%, and 99.25%, respectively....

  16. Electroluminescence and photoluminescence of conjugated polymer films prepared by plasma enhanced chemical vapor deposition of naphthalene

    CERN Document Server

    Rajabi, Mojtaaba; Firouzjah, Marzieh Abbasi; Hosseini, Seyed Iman; Shokri, Babak

    2012-01-01

    Polymer light-emitting devices were fabricated utilizing plasma polymerized thin films as emissive layers. These conjugated polymer films were prepared by RF Plasma Enhanced Chemical Vapor Deposition (PECVD) using naphthalene as monomer. The effect of different applied powers on the chemical structure and optical properties of the conjugated polymers was investigated. The fabricated devices with structure of ITO/PEDOT:PSS/ plasma polymerized Naphthalene/Alq3/Al showed broadband Electroluminescence (EL) emission peaks with center at 535-550 nm. Using different structural and optical tests, connection between polymers chemical structure and optical properties under different plasma powers has been studied. Fourier transform infrared (FTIR) and Raman spectroscopies confirmed that a conjugated polymer film with a 3-D cross-linked network was developed. By increasing the power, products tended to form as highly cross-linked polymer films. Photoluminescence (PL) spectra of plasma polymers showed different excimerc ...

  17. Langmuir probe study of an inductively coupled magnetic-pole-enhanced helium plasma

    Science.gov (United States)

    Younus, Maria; Rehman, N. U.; Shafiq, M.; Naeem, M.; Zaka-ul-Islam, M.; Zakaullah, M.

    2017-03-01

    This study reports the effects of RF power and filling gas pressure variation on the plasma parameters, including the electron number density n e , electron temperature T e , plasma potential V p , skin depth δ, and electron energy probability functions (EEPFs) in a low-pressure inductively coupled helium plasma source with magnetic pole enhancement. An RF compensated Langmuir probe is used to measure these plasma parameters. It is observed that the electron number density increases with both the RF power and the filling gas pressure. Conversely, the electron temperature decreases with increasing RF power and gas pressure. It is also noted that, at low RF powers and gas pressures, the EEPFs are non-Maxwellian, while at RF powers of ≥50 W, they evolve into a Maxwellian distribution. The dependences of the skin depth and plasma potential on the RF power are also studied and show a decreasing trend.

  18. Enhancement of photocatalytic activity of TiO2 by plasma irradiation

    Science.gov (United States)

    Kajita, Shin; Yoshida, Tomoko; Ohno, Noriyasu; Ishida, Tomoya; Kitaoka, Daiki

    2016-10-01

    In this study, plasma irradiations to titanium were conducted to enhance the photocatalytic activity of titanium oxide. When titanium is exposed to He plasmas, various morphology changes occur as forming nano-bubbles near the surface. Photocatalytic activity of the oxidized helium plasma irradiated titanium samples with nano-cones and microstructures were assessed by the hydrogen production from aqueous methanol solution. It is shown that the He plasma irradiation increases the photocatalytic activity more than double. Moreover, nitrogen mixture plasma irradiation to titanium (oxide) was conducted for doping nitrogen, which has been regarded as method to create visible light reactivity. It is shown from X-ray photoelectron spectroscopy (XPS) analysis that nitrogen doping has been successfully conducted under specific conditions.

  19. Enhancement of Limb Growth by Non-Thermal Plasma Generated Reactive Species

    Science.gov (United States)

    Shainsky, N.; Steinbeck, M.; Fridman, G.; Fridman, A.; Friedman, G.; Freeman, T.

    2013-09-01

    Introduction: The goal of this investigation was to examine the effect of Dielectric Barrier Discharge plasma on mouse autopod differentiation and growth. In this study we hypothesized that NT-plasma can be used to promote redox dependent changes in differentiation pathways and enhance developmental signaling? Methods: Approximately 1 hour after isolation, NT-plasma or sham plasma treatment was applied to the right or left limb, respectively. The medium was changed daily thereafter for the 4-6 days of culture. NT-plasma treatment: pulsed (1000 Hz) voltage of 17 - 25 kV magnitude (peak to peak), a 1 μs pulse width and a rise time of 5 V/ns between the quartz-insulated high voltage electrode and the sample undergoing treatment. Results: A single 10 second NT-plasma treatment promoted development of mouse autopods as compared to the sham control contralateral limb. NT-plasma accelerated digit growth in both E14.5 and E12.5 autopods. Inhibitors were used to determine the role of ROS and RNS in mediating NT-plasma accelerated autopod development. Treatment with these agents stunted autopod morphogenesis NT-plasma treatment partially rescued development. Discussion: Our findings highlight the capability of NT-plasma to activate ROS-dependent cell signaling cascades within developing autopod tissue. In fact, the effect of NT-plasma may indeed extend beyond ROS sensitive signaling as NT-plasma exposure seems to stimulate some growth even in the presence of antioxidant induced stunting. This work was supported by NIH Grants 1 R01 EB 013011 - 01 (Freeman and G. Fridman).

  20. First plasma operation of the enhanced JET vertical stabilisation system

    NARCIS (Netherlands)

    Rimini, F. G.; Crisanti, F.; Albanese, R.; Ambrosino, G.; Ariola, M.; Artaserse, G.; Bellizio, T.; Coccorese, V.; De Tommasi, G.; P. de Vries,; Lomas, P. J.; Maviglia, F.; Neto, A.; Nunes, I.; Pironti, A.; Ramogida, G.; Sartori, F.; Shaw, S. R.; Tsalas, M.; Vitelli, R.; Zabeo, L.

    2011-01-01

    A project dedicated to the enhancement of the JET vertical stabilization system was launched in 2006, including an upgrade of the Power Supply of the Radial Field Amplifier, of hardware and software of the vertical stabilization control system. The main aim was to double the JET capability in stabil

  1. Duration of ultrasound-mediated enhanced plasma membrane permeability

    NARCIS (Netherlands)

    Lammertink, Bart; Deckers, Roel; Storm, Gert; Moonen, Chrit; Bos, Clemens

    2015-01-01

    Ultrasound (US) induced cavitation can be used to enhance the intracellular delivery of drugs by transiently increasing the cell membrane permeability. The duration of this increased permeability, termed temporal window, has not been fully elucidated. In this study, the temporal window was investiga

  2. Duration of ultrasound-mediated enhanced plasma membrane permeability

    NARCIS (Netherlands)

    Lammertink, Bart; Deckers, Roel; Storm, Gerrit; Moonen, Chrit; Bos, Clemens

    2015-01-01

    Ultrasound (US) induced cavitation can be used to enhance the intracellular delivery of drugs by transiently increasing the cell membrane permeability. The duration of this increased permeability, termed temporal window, has not been fully elucidated. In this study, the temporal window was

  3. Enhancement of NOx and hydrocarbon conversion in plasma-activated catalysis

    Science.gov (United States)

    Graham, Bill; Adress, Wahmeed; Goguet, Alexandre; Yang, Hui; De Rosa, Fabio; Hardacre, Christopher; Stere, Cristina

    2016-09-01

    Atmospheric pressure, non-thermal plasma-activated-catalysis is showing real promise in a number of applications. Here we report on how electrical, visible and FTIR spectroscopy and mass spectroscopy measurements in a kHz atmospheric pressure He plasma jet coupled with a Ag/Al2O3 catalyst allowed us produce and confirm a strong enhancement of both NOx and hydrocarbon conversion at a measured gas temperature of <= 250° C. How these and other measurements have provided an insight into the fundamental physical and chemical processes in the plasma environment that have helped us move to a more efficient system and other processes will be discussed.

  4. Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber

    Energy Technology Data Exchange (ETDEWEB)

    Dechana, A. [Program of Physics and General Science, Faculty of Science and Technology, Songkhla Rajabhat University, Songkhla 90000 (Thailand); Thamboon, P. [Science and Technology Research Institute, Chiang Mai University, Chiang Mai 50200 (Thailand); Boonyawan, D., E-mail: dheerawan.b@cmu.ac.th [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand)

    2014-10-15

    A microwave remote Plasma Enhanced-Atomic Layer Deposition system with multicusp confinement chamber is established at the Plasma and Beam Physics research facilities, Chiang Mai, Thailand. The system produces highly-reactive plasma species in order to enhance the deposition process of thin films. The addition of the multicusp magnetic fields further improves the plasma density and uniformity in the reaction chamber. Thus, the system is more favorable to temperature-sensitive substrates when heating becomes unwanted. Furthermore, the remote-plasma feature, which is generated via microwave power source, offers tunability of the plasma properties separately from the process. As a result, the system provides high flexibility in choice of materials and design experiments, particularly for low-temperature applications. Performance evaluations of the system were carried on coating experiments of Al{sub 2}O{sub 3} layers onto a silicon wafer. The plasma characteristics in the chamber will be described. The resulted Al{sub 2}O{sub 3} films—analyzed by Rutherford Backscattering Spectrometry in channeling mode and by X-ray Photoelectron Spectroscopy techniques—will be discussed.

  5. Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber

    Science.gov (United States)

    Dechana, A.; Thamboon, P.; Boonyawan, D.

    2014-10-01

    A microwave remote Plasma Enhanced-Atomic Layer Deposition system with multicusp confinement chamber is established at the Plasma and Beam Physics research facilities, Chiang Mai, Thailand. The system produces highly-reactive plasma species in order to enhance the deposition process of thin films. The addition of the multicusp magnetic fields further improves the plasma density and uniformity in the reaction chamber. Thus, the system is more favorable to temperature-sensitive substrates when heating becomes unwanted. Furthermore, the remote-plasma feature, which is generated via microwave power source, offers tunability of the plasma properties separately from the process. As a result, the system provides high flexibility in choice of materials and design experiments, particularly for low-temperature applications. Performance evaluations of the system were carried on coating experiments of Al2O3 layers onto a silicon wafer. The plasma characteristics in the chamber will be described. The resulted Al2O3 films—analyzed by Rutherford Backscattering Spectrometry in channeling mode and by X-ray Photoelectron Spectroscopy techniques—will be discussed.

  6. CVD 908, CVD 908-htrA, and CVD 909 live oral typhoid vaccines: a logical progression.

    Science.gov (United States)

    Tacket, Carol O; Levine, Myron M

    2007-07-15

    Typhoid fever remains an important public health problem in many parts of the world. Despite the availability of oral Ty21a (Vivotif; Berna Biotech) and parenteral Vi polysaccharide vaccine (Typhim Vi; Aventis Pasteur), improved typhoid fever vaccines have been sought. These include a series of vaccine candidates developed at the Center for Vaccine Development, University of Maryland, based on attenuation of Salmonella enterica serovar Typhi by deletions in the aroC, aroD, and htrA genes. These vaccine candidates, designated "CVD 908," "CVD 908-htrA," and "CVD 909," have been developed and tested in volunteers with variable success. This review summarizes the clinical data that directed the logical progression of this vaccine development strategy.

  7. Atmospheric pressure plasma enhanced spatial ALD of silver

    Energy Technology Data Exchange (ETDEWEB)

    Bruele, Fieke J. van den, E-mail: Fieke.vandenBruele@tno.nl; Smets, Mireille; Illiberi, Andrea; Poodt, Paul [Holst Centre/TNO, High Tech Campus 31, 5656 AE Eindhoven (Netherlands); Creyghton, Yves [TNO, High Tech Campus 21, 5656 AE Eindhoven (Netherlands); Buskens, Pascal [TNO, Rondom 1, 5612 AP Eindhoven, The Netherlands and DWI Leibniz-Institut für Interaktive Materialien, Aachen (Germany); Roozeboom, Fred [TNO, High Tech Campus 21, 5656 AE Eindhoven, The Netherlands and Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven (Netherlands)

    2015-01-15

    The authors have investigated the growth of thin silver films using a unique combination of atmospheric process elements: spatial atomic layer deposition and an atmospheric pressure surface dielectric barrier discharge plasma source. Silver films were grown on top of Si substrates with good purity as revealed by resistivity values as low as 18 μΩ cm and C- and F-levels below detection limits of energy dispersive x-ray analysis. The growth of the silver films starts through the nucleation of islands that subsequently coalesce. The authors show that the surface island morphology is dependent on surface diffusion, which can be controlled by temperature within the deposition temperature range of 100–120 °C.

  8. Knowledge of risk factors for diabetes or cardiovascular disease (CVD) is poor among individuals with risk factors for CVD.

    Science.gov (United States)

    Kilkenny, Monique F; Dunstan, Libby; Busingye, Doreen; Purvis, Tara; Reyneke, Megan; Orgill, Mary; Cadilhac, Dominique A

    2017-01-01

    There is limited evidence on whether having pre-existing cardiovascular disease (CVD) or risk factors for CVD such as diabetes, ensures greater knowledge of risk factors important for motivating preventative behaviours. Our objective was to compare knowledge among the Australian public participating in a health check program and their risk status. Data from the Stroke Foundation 'Know your numbers' program were used. Staff in community pharmacies provided opportunistic health checks (measurement of blood pressure and diabetes risk assessment) among their customers. Participants were categorised: 1) CVD ± risk of CVD: history of stroke, heart disease or kidney disease, and may have risk factors; 2) risk of CVD only: reported having high blood pressure, high cholesterol, diabetes or atrial fibrillation; and 3) CVD risk free (no CVD or risk of CVD). Multivariable logistic regression analyses were performed including adjustment for age and sex. Among 4,647 participants, 12% had CVD (55% male, 85% aged 55+ years), 47% were at risk of CVD (40% male, 72% 55+ years) and 41% were CVD risk free (33% male, 27% 55+ years). Participants with CVD (OR: 0.66; 95% CI: 0.55, 0.80) or risk factors for CVD (OR: 0.65; 95% CI: 0.57, 0.73) had poorer knowledge of the risk factors for diabetes/CVD compared to those who were CVD risk free. After adjustment, only participants with risk factors for CVD (OR: 0.80; 95% CI: 0.69, 0.93) had poorer knowledge. Older participants (55+ years) and men had poorer knowledge of diabetes/CVD risk factors and complications of diabetes. Participants with poorer knowledge of risk factors were older, more often male or were at risk of developing CVD compared with those who were CVD risk free. Health education in these high risk groups should be a priority, as diabetes and CVD are increasing in prevalence throughout the world.

  9. Ni-catalysed carbon nanotubes and nanofibers assemblies grown on TiN/Si(1 0 0) substrates using hot-filaments combined with d.c. plasma CVD

    Science.gov (United States)

    Fleaca, Claudiu Teodor; Le Normand, François

    2014-02-01

    Different carbon nanotubes or nanofibers (CNTs or CNFs) assemblies were obtained using Ni catalyst deposited by Pulsed Laser Deposition (PLD) on TiN/Si(1 0 0) substrate from a H2/C2H2 mixture using plasma emerging from triode configured electrodes with two pairs of intercalated incandescent filaments at 1 kPa and 700 °C. In the presence of a relative intense plasma (54 W power), a dense CNT carpet was grown. The TEM images revealed the presence of elongated yet contorted 10-15 nm diameter CNTs with encapsulated Ni particles at their tips. Using a low plasma power (8 W) in similar conditions and from the same catalyst, a different morphology resulted: few self-sustained long fibrils (diameter around 1 μm) which are curved under the action of their own weight containing compacted CNTs/CNFs and (only in the confined zones near the lateral edges) 50-200 nm thick filaments presenting buds-like structures and Y-shape junctions.

  10. The Charge Collection Properties of CVD Diamond

    CERN Document Server

    Behnke, T; Oh, A; Steuerer, J; Wagner, A; Zeuner, W; Behnke, Ties; Hüntemeyer, Petra; Oh, Alexander; Steuerer, Johannes; Wagner, Albrecht; Zeuner, Wolfram

    1998-01-01

    The charge collection properties of CVD diamond have been investigated with ionising radiation. In this study two CVD diamond samples, prepared with electrical contacts have been used as solid state ionisation chambers. The diamonds have been studied with beta particles and 10 keV photons, providing a homogeneous ionisation density and with protons and alpha particles which are absorbed in a thin surface layer. For the latter case a strong decrease of the signal as function of time is observed, which is attributed to polarisation effects inside the diamond. Spatially resolved measurements with protons show a large variation of the charge collection efficiency, whereas for photons and minimum ionising particles the response is much more uniform and in the order of 18%. These results indicate that the applicability of CVD diamond as a position sensitive particle detector depends on the ionisation type and appears to be promising for homogeneous ionisation densities as provided by relativistic charged particles.

  11. Substrate Strengthening of CVD Coated Steels

    Institute of Scientific and Technical Information of China (English)

    O.Kessler; M.Heidkamp; F.Hoffmann; P.Mayr

    2004-01-01

    Properties of components and tools can be improved by the combination of coating and heat treatment processes due to the addition of single process advantages and due to the utilization of process interactions. Several low and high alloyed, structural and tool steels (AISI 4140, 52100, H13, A2, D2, etc.) have been treated by CVD-TiN-coating plus laser beam hardening respectively carburizing plus CVD-TiN-coating. Homogeneous, dense TiN-coatings with high hardness,high compressive residual stresses and good adhesion were supported by high strength substrate surfaces. Especially CVD plus laser beam hardening offers the possibility to reduce distortion due to the small heated surface volume.

  12. Low temperature growth of diamond films on optical fibers using Linear Antenna CVD system

    Science.gov (United States)

    Ficek, M.; Drijkoningen, S.; Karczewski, J.; Bogdanowicz, R.; Haenen, K.

    2016-01-01

    It is not trivial to achieve a good quality diamond-coated fibre interface due to a large difference in the properties and composition of the diamond films (or use coating even) and the optical fibre material, i.e. fused silica. One of the biggest problems is the high temperature during the deposition which influences the optical fibre or optical fibre sensor structure (e.g. long-period gratings (LPG)). The greatest advantage of a linear antenna microwave plasma enhanced chemical vapor deposition system (LA MW CVD) is the fact that it allows to grow the diamond layers at low temperature (below 300°C) [1]. High quality nanocrystalline diamond (NCD) thin films with thicknesses ranging from 70 nm to 150 nm, were deposited on silicon, glass and optical fibre substrates [2]. Substrates pretreatment by dip-coating and spin coating process with a dispersion consisting of detonation nanodiamond (DND) in dimethyl sulfoxide (DMSO) with polyvinyl alcohol (PVA) has been applied. During the deposition process the continuous mode of operation of the LA MW CVD system was used, which produces a continuous wave at a maximum power of 1.9 kW (in each antenna). Diamond films on optical fibres were obtained at temperatures below 350°C, providing a clear improvement of results compared to our earlier work [3]. The samples were characterized by scanning electron microscopy (SEM) imaging to investigate the morphology of the nanocrystalline diamond films. The film growth rate, film thickness, and optical properties in the VIS-NIR range, i.e. refractive index and extinction coefficient will be discussed based on measurements on reference quartz plates by using spectroscopic ellipsometry (SE).

  13. Development of CVD Mullite Coatings for SiC Fibers

    Energy Technology Data Exchange (ETDEWEB)

    Sarin, V.K.; Varadarajan, S.

    2000-03-15

    A process for depositing CVD mullite coatings on SiC fibers for enhanced oxidation and corrosion, and/or act as an interfacial protective barrier has been developed. Process optimization via systematic investigation of system parameters yielded uniform crystalline mullite coatings on SiC fibers. Structural characterization has allowed for tailoring of coating structure and therefore properties. High temperature oxidation/corrosion testing of the optimized coatings has shown that the coatings remain adherent and protective for extended periods. However, preliminary tests of coated fibers showed considerable degradation in tensile strength.

  14. Aligned carbon nanotubes catalytically grown on iron-based nanoparticles obtained by laser-induced CVD

    OpenAIRE

    Le Normand, Francois; Cojocaru, Costel Sorin; Ersen, Ovidiu; Legagneux, Pierre; Gangloff, Laurent; Fleaca, C.; Alexandrescu, Rodica; Dumitrache, Florin; Morjan, Ion

    2007-01-01

    International audience; Iron-based nanoparticles are prepared by a laser-induced chemical vapor deposition (CVD) process. They are characterized as body-centered Fe and Fe2O3 (maghemite/magnetite) particles with sizes ::;5 and 10 nm, respectively. The Fe particles are embedded in a protective carbon matrix. Both kind of particles are dispersed by spin-coating on SiO2/Si(1 0 0) flat substrates. They are used as catalyst to grow carbon nanotubes by a plasma- and filaments-assisted catalytic CVD...

  15. Control of interface nanoscale structure created by plasma-enhanced chemical vapor deposition.

    Science.gov (United States)

    Peri, Someswara R; Akgun, Bulent; Satija, Sushil K; Jiang, Hao; Enlow, Jesse; Bunning, Timothy J; Foster, Mark D

    2011-09-01

    Tailoring the structure of films deposited by plasma-enhanced chemical vapor deposition (PECVD) to specific applications requires a depth-resolved understanding of how the interface structures in such films are impacted by variations in deposition parameters such as feed position and plasma power. Analysis of complementary X-ray and neutron reflectivity (XR, NR) data provide a rich picture of changes in structure with feed position and plasma power, with those changes resolved on the nanoscale. For plasma-polymerized octafluorocyclobutane (PP-OFCB) films, a region of distinct chemical composition and lower cross-link density is found at the substrate interface for the range of processing conditions studied and a surface layer of lower cross-link density also appears when plasma power exceeds 40 W. Varying the distance of the feed from the plasma impacts the degree of cross-linking in the film center, thickness of the surface layer, and thickness of the transition region at the substrate. Deposition at the highest power, 65 W, both enhances cross-linking and creates loose fragments with fluorine content higher than the average. The thickness of the low cross-link density region at the air interface plays an important role in determining the width of the interface built with a layer subsequently deposited atop the first.

  16. Nonthermal atmospheric pressure plasma enhances mouse limb bud survival, growth, and elongation.

    Science.gov (United States)

    Chernets, Natalie; Zhang, Jun; Steinbeck, Marla J; Kurpad, Deepa S; Koyama, Eiki; Friedman, Gary; Freeman, Theresa A

    2015-01-01

    The enhanced differentiation of mesenchymal cells into chondrocytes or osteoblasts is of paramount importance in tissue engineering and regenerative therapies. A newly emerging body of evidence demonstrates that appendage regeneration is dependent on reactive oxygen species (ROS) production and signaling. Thus, we hypothesized that mesenchymal cell stimulation by nonthermal (NT)-plasma, which produces and induces ROS, would (1) promote skeletal cell differentiation and (2) limb autopod development. Stimulation with a single treatment of NT-plasma enhanced survival, growth, and elongation of mouse limb autopods in an in vitro organ culture system. Noticeable changes included enhanced development of digit length and definition of digit separation. These changes were coordinated with enhanced Wnt signaling in the distal apical epidermal ridge (AER) and presumptive joint regions. Autopod development continued to advance for approximately 144 h in culture, seemingly overcoming the negative culture environment usually observed in this in vitro system. Real-time quantitative polymerase chain reaction analysis confirmed the up-regulation of chondrogenic transcripts. Mechanistically, NT-plasma increased the number of ROS positive cells in the dorsal epithelium, mesenchyme, and the distal tip of each phalange behind the AER, determined using dihydrorhodamine. The importance of ROS production/signaling during development was further demonstrated by the stunting of digital outgrowth when anti-oxidants were applied. Results of this study show NT-plasma initiated and amplified ROS intracellular signaling to enhance development of the autopod. Parallels between development and regeneration suggest that the potential use of NT-plasma could extend to both tissue engineering and clinical applications to enhance fracture healing, trauma repair, and bone fusion.

  17. Localized microwave pulsed plasmas for ignition and flame front enhancement

    Science.gov (United States)

    Michael, James Bennett

    Modern combustor technologies require the ability to match operational parameters to rapidly changing demands. Challenges include variable power output requirements, variations in air and fuel streams, the requirement for rapid and well-controlled ignition, and the need for reliability at low fuel mixture fractions. Work on subcritical microwave coupling to flames and to weakly ionized laser-generated plasmas has been undertaken to investigate the potential for pulsed microwaves to allow rapid combustion control, volumetric ignition, and leaner combustion. Two strategies are investigated. First, subcritical microwaves are coupled to femtosecond laser-generated ionization to ignite methane/air mixtures in a quasi-volumetric fashion. Total energy levels are comparable to the total minimum ignition energies for laser and spark discharges, but the combined strategy allows a 90 percent reduction in the required laser energy. In addition, well-defined multi-dimensional ignition patterns are designated with multiple laser passes. Second, microwave pulse coupling to laminar flame fronts is achieved through interaction with chemiionization-produced electrons in the reaction zone. This energy deposition remains well-localized for a single microwave pulse, resulting in rapid temperature rises of greater than 200 K and maintaining flame propagation in extremely lean methane/air mixtures. The lean flammability limit in methane/air mixtures with microwave coupling has been decreased from an equivalence ratio 0.6 to 0.3. Additionally, a diagnostic technique for laser tagging of nitrogen for velocity measurements is presented. The femtosecond laser electronic excitation tagging (FLEET) technique utilizes a 120 fs laser to dissociate nitrogen along a laser line. The relatively long-lived emission from recombining nitrogen atoms is imaged with a delayed and fast-gated camera to measure instantaneous velocities. The emission strength and lifetime in air and pure nitrogen allow

  18. Evolution of plasma parameters in an Ar-N2/He inductive plasma source with magnetic pole enhancement

    Science.gov (United States)

    Maria, Younus; N, U. Rehman; M, Shafiq; M, Naeem; M, Zaka-Ul-Islam; M, Zakaullah

    2017-02-01

    Magnetic pole enhanced inductively coupled plasmas (MaPE-ICPs) are a promising source for plasma-based etching and have a wide range of material processing applications. In the present study Langmuir probe and optical emission spectroscopy were used to monitor the evolution of plasma parameters in a MaPE-ICP Ar-N2/He mixture plasma. Electron density ({n}{{e}}) and temperature ({T}{{e}}), excitation temperature ({T}{{exc}}), plasma potential ({V}{{p}}), skin depth (δ ) and the evolution of the electron energy probability function (EEPF) are reported as a function of radiofrequency (RF) power, pressure and argon concentration in the mixture. It is observed that {n}{{e}} increases while {T}{{e}} decreases with increase in RF power and argon concentration in the mixture. The emission intensity of the argon line at 750.4 nm is also used to monitor the variation of the ‘high-energy tail’ of the EEPF with RF power and gas pressure. The EEPF has a ‘bi-Maxwellian’ distribution at low RF powers and higher pressure in a pure {{{N}}}2 discharge. However, it evolves into a ‘Maxwellian’ distribution at RF powers greater than 70 W for pure {{{N}}}2, and at 50 W for higher argon concentrations in the mixture. The effect of argon concentration on the temperatures of two electron groups in the ‘bi-Maxwellian’ EEPF is examined. The temperature of the low-energy electron group {T}{{L}} shows a decreasing trend with argon addition until the ‘thermalization’ of the two temperatures occurs, while the temperature of high-energy electrons {T}{{H}} decreases continuously.

  19. 直流电弧等离子体喷射CVD硼掺杂金刚石薄膜的制备及电化学性能研究%Electrochemical Properties of Boron Doped Diamond Films Prepared by DC Arc Plasma Jet CVD

    Institute of Scientific and Technical Information of China (English)

    张聪聪; 戴玮; 朱宁; 尹振超; 吴小国; 曲长庆

    2012-01-01

    Boron doped diamond films on silicon ( BDD) substrates were deposited by DC ARC Plasma Jet CVD (Chemical Vapor Deposition) , SEM, XRD and Raman spectroscopy were employed to analyze the morphology, crystal structure and film quality. The SEM and XRD show jointly that the samples are high-quality polycrystalline diamond films composed of micro meter-sized grains. The Raman spectrum show the 1126 cm-1,1336 cm -1and 1560 cm-1, respectively corresponds to peak due to boron incorporation, sp3 carbon peak ,and sp2 carbon peak. Study the effects of pressure and (100) BDD films were deposited at the pressure of 5500 Pa. The resistivity and carrier concentration of the (111) films measured by the Hall system, respectively corresponds to 0. 0095 Ω · cm and 1. 1 × 1020 cm-3. The electrochemical behaviors of the boron-doped diamond film electrode in sodium sulfate solution, potassium ferrocyanide/ potassium ferricyanide solution and dopamine solution are studied. The results show that the' diamond film electrode have a wide electrochemical window of about 4 V and a low background current close to zero in the aqua solution, meanwhile they have a high sensitivity, good stability and reversibility in the dopamine detection experiment which makes boron-doped diamond film obtained by DC ARC Plasma Jet CVD being an excellent material of electrochemical electrode.%采用直流电弧等离子体喷射CVD(Chemical Vapor Deposition)法在硅(100)衬底上制备了(111)占优的掺硼金刚石(BDD)薄膜,研究了压强对薄膜生长的影响,在压强为5500Pa时得到了(100)占优的金刚石薄膜,并用SEM、XRD及拉曼光谱分析了薄膜的表面形貌、晶体结构、薄膜品质.测试结果表明,掺硼金刚石膜具有较好的成膜质量.霍尔测试表明BDD的电阻率为0.0095Ω·cm,载流子浓度为1.1×1020 cm-3;研究了BDD薄膜电极在硫酸钠空白底液、铁氰化钾/亚铁氰化钾溶液和多巴胺溶液中的循环伏安曲线(CVs),发现该金刚

  20. Single liquid source plasma-enhanced metalorganic chemical vapor deposition of high-quality YBa2Cu3O(7-x) thin films

    Science.gov (United States)

    Zhang, Jiming; Gardiner, Robin A.; Kirlin, Peter S.; Boerstler, Robert W.; Steinbeck, John

    1992-01-01

    High quality YBa2Cu3O(7-x) films were grown in-situ on LaAlO3 (100) by a novel single liquid source plasma-enhanced metalorganic chemical vapor deposition process. The metalorganic complexes M(thd) (sub n), (thd = 2,2,6,6-tetramethyl-3,5-heptanedionate; M = Y, Ba, Cu) were dissolved in an organic solution and injected into a vaporizer immediately upstream of the reactor inlet. The single liquid source technique dramatically simplifies current CVD processing and can significantly improve the process reproducibility. X-ray diffraction measurements indicated that single phase, highly c-axis oriented YBa2Cu3O(7-x) was formed in-situ at substrate temperature 680 C. The as-deposited films exhibited a mirror-like surface, had transition temperature T(sub cO) approximately equal to 89 K, Delta T(sub c) less than 1 K, and Jc (77 K) = 10(exp 6) A/sq cm.

  1. Single liquid source plasma-enhanced metalorganic chemical vapor deposition of high-quality YBa2Cu3O(7-x) thin films

    Science.gov (United States)

    Zhang, Jiming; Gardiner, Robin A.; Kirlin, Peter S.; Boerstler, Robert W.; Steinbeck, John

    1992-01-01

    High quality YBa2Cu3O(7-x) films were grown in-situ on LaAlO3 (100) by a novel single liquid source plasma-enhanced metalorganic chemical vapor deposition process. The metalorganic complexes M(thd) (sub n), (thd = 2,2,6,6-tetramethyl-3,5-heptanedionate; M = Y, Ba, Cu) were dissolved in an organic solution and injected into a vaporizer immediately upstream of the reactor inlet. The single liquid source technique dramatically simplifies current CVD processing and can significantly improve the process reproducibility. X-ray diffraction measurements indicated that single phase, highly c-axis oriented YBa2Cu3O(7-x) was formed in-situ at substrate temperature 680 C. The as-deposited films exhibited a mirror-like surface, had transition temperature T(sub cO) approximately equal to 89 K, Delta T(sub c) less than 1 K, and Jc (77 K) = 10(exp 6) A/sq cm.

  2. Growth enhancement effects of radish sprouts: atmospheric pressure plasma irradiation vs. heat shock

    Science.gov (United States)

    Sarinont, T.; Amano, T.; Kitazaki, S.; Koga, K.; Uchida, G.; Shiratani, M.; Hayashi, N.

    2014-06-01

    We compare growth enhancement effects due to atmospheric air dielectric barrier discharge plasma irradiation and heat shock to seeds of radish sprouts (Raphanus sativus L.). Interactions between radicals and seeds in a short duration of 3 min. lead to the growth enhancement of radish sprouts in a long term of 7 days and the maximum average length is 3.7 times as long as that of control. The growth enhancement effects become gradually weak with time, and hence the ratio of the average length for plasma irradiation to that for control decreases from 3.7 for the first day to 1.3 for 7 day. The average length for heat shock of 60°C for 10 min. and 100°C for 3 min. is longer than that for control, and the maximum average length is 1.3 times as long as that of control. Heat shock has little contribution to the growth enhancement due to plasma irradiation, because the maximum temperature due to plasma irradiation is less than 60°C.

  3. Enhancement of food safety – antimicrobial effectiveness of cold plasma treatments

    Directory of Open Access Journals (Sweden)

    Irina SMEU

    2014-08-01

    Full Text Available Cold plasma treatment proved to be a flexible, efficient, chemical-free antimicrobial process and it can represent an easy to use sanitizing method for the food industry that does not require special temperature, humidity or pressure conditions. This paper reviews the classification of plasma and the main cold plasma generating devices used in the recent years to enhance food safety. A research of available literature was also conducted to identify the antimicrobial mode of action of cold plasma treatment as well as advantages and key limitations of this technique when applied to different food products such as fruits, vegetables, meat and milk. The study revealed that further development of this method will have to be carried out, allowing better understanding of the complex interactions during applications and its restrictions, as well as practice outlook.

  4. Enhanced toroidal flow stabilization of edge localized modes with increased plasma density

    Science.gov (United States)

    Cheng, Shikui; Zhu, Ping; Banerjee, Debabrata

    2017-09-01

    Toroidal flow alone is generally thought to have an important influence on tokamak edge pedestal stability, even though theoretical analysis often predicts merely a weak stabilizing effect of toroidal flow on the edge localized modes (ELMs) in experimental parameter regimes. For the first time, we find from two-fluid MHD calculations that such a stabilization, however, can be significantly enhanced by increasing the edge plasma density. Our finding resolves a long-standing mystery whether or how toroidal rotation can indeed have an effective influence on ELMs, and explains why the ELM mitigation and suppression by toroidal rotation are more favorably achieved in higher collisionality regime in recent experiments. The finding suggests a new control scheme on modulating toroidal flow stabilization of ELMs with plasma density, along with a new additional constraint on the optimal level of plasma density for the desired edge plasma conditions.

  5. Antifouling enhancement of polysulfone/TiO2 nanocomposite separation membrane by plasma etching

    Science.gov (United States)

    Chen, Z.; Yin, C.; Wang, S.; Ito, K.; Fu, Q. M.; Deng, Q. R.; Fu, P.; Lin, Z. D.; Zhang, Y.

    2017-01-01

    A polysulfone/TiO2 nanocomposite membrane was prepared via casting method, followed by the plasma etching of the membrane surface. Doppler broadened energy spectra vs. positron incident energy were employed to elucidate depth profiles of the nanostructure for the as-prepared and treated membranes. The results confirmed that the near-surface of the membrane was modified by the plasma treatment. The antifouling characteristics for the membranes, evaluated using the degradation of Rhodamin B, indicated that the plasma treatment enhances the photo catalytic ability of the membrane, suggesting that more TiO2 nanoparticles are exposed at the membrane surface after the plasma treatment as supported by the positron result.

  6. Enhancement-mode AlGaN/GaN HEMTs fabricated by fluorine plasma treatment

    Institute of Scientific and Technical Information of China (English)

    Quan Si; Hao Yue; Ma Xiaohua; Xie Yuanbin; Ma Jigang

    2009-01-01

    The fabrication of enhancement-mode A1GaN/GaN HEMTs by fluorine plasma treatment on sapphire substrates is reported. A new method is used to fabricate devices with different fluorine plasma RF power treatments on one wafer to avoid differences between different wafers. The plasma-treated gate regions of devices treated with different fluorine plasma RF powers were separately opened by a step-and-repeat system. The properties of these devices are compared and analyzed. The devices with 150 W fluorine plasma treatment power and with 0.6μm gate-length exhibited a threshold voltage of 0.57 V, a maximum drain current of 501 mA/mm, a maximumtransconductance of 210 m S/mm, a current gain cutoff frequency of 19.4 GHz and a maximum oscillation frequency of 26 GHz. An excessive fluorine plasma treatment power of 250 W results in a small maximum drain current, which can be attributed to the implantation of fluorine plasma in the channel.

  7. Enhanced Field Emission from Argon Plasma-Treated Ultra-sharp α-Fe2O3Nanoflakes

    Directory of Open Access Journals (Sweden)

    Zhang JX

    2009-01-01

    Full Text Available Abstract Hematite nanoflakes have been synthesized by a simple heat oxide method and further treated by Argon plasmas. The effects of Argon plasma on the morphology and crystal structures of nanoflakes were investigated. Significant enhancement of field-induced electron emission from the plasma-treated nanoflakes was observed. The transmission electron microscopy investigation shows that the plasma treatment effectively removes amorphous coating and creates plenty of sub-tips at the surface of the nanoflakes, which are believed to contribute the enhancement of emission. This work suggests that plasma treatment technique could be a direct means to improve field-emission properties of nanostructures.

  8. Response of CVD Diamond Detectors to 14 MeV Neutrons

    CERN Document Server

    Weiss, C; Gagnon-Moisan, F; Kasper, A; Lucke, A; Schuhmacher, H; Weierganz, M; Zimba, A

    2012-01-01

    A series of measurements was taken at the Physikalisch-Technische Bundesanstalt (PTB) Braunschweig [1] using the 14 MeV neutron beam at the Van der Graaf accelerator with chemical vapor deposition (CVD) diamond detectors, in preparation of an upcoming (n, ) cross-section measurement [2] at the CERN-n TOF experiment [3, 4]. A single-crystal (sCVD) as well as a poly-crystalline (pCVD) diamond detector were used for the measurements. The response of both materials to the mono-energetic neutron beam was studied, also with the prospect for future applications in plasma diagnostics for fusion research. The results of the measurements are presented in this report.

  9. FY1995 development of a clean CVD process by evaluation and control of gas phase nucleation phenomena; 1995 nendo kisokaku seisei gensho no hyoka to seigyo ni yoru clean CVD process no kaihatsu

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1997-03-01

    The purpose of this study is to develop a high-rate and clean chemical vapor deposition (CVD) process as a breakthrough technique to overcome the problems that particles generated in the gas phase during CVD process for preparation of functional thin films cause reduced product yield and deterioration of the films. In the CVD process proposed here, reactant gas and generated particles are electrically charged to control the motion of them with an electric field. In this study, gas-phase nucleation phenomena are evaluated both theoretically and experimentally. A high-rate, ionized CVD method is first developed, in which reactant gas and generated particles are charged with negative ions generated from a radioisotope source and the UV/photoelectron method, and the motion of the charged gas and particles is controlled with an electric field. Charging and transport processes of fine particles are then investigated experimentally and theoretically to develop a clean CVD method in which generated particles are removed with the electric forces. As a result, quantitative evaluation of the charging and transport process was made possible. We also developed devices for measuring the size distribution and concentration of fine particles in low pressure gas such as those found in plasma CVD processes. In addition, numerical simulation and experiments in this study for a TEOS/O{sub 3} CVD process to prepare thin films could determine reaction rates which have not been known so far and give information on selecting good operation conditions for the process. (NEDO)

  10. CVD diamond pixel detectors for LHC experiments

    Energy Technology Data Exchange (ETDEWEB)

    Wedenig, R.; Adam, W.; Bauer, C.; Berdermann, E.; Bergonzo, P.; Bogani, F.; Borchi, E.; Brambilla, A.; Bruzzi, M.; Colledani, C.; Conway, J.; Dabrowski, W.; Delpierre, P.; Deneuville, A.; Dulinski, W.; Eijk, B. van; Fallou, A.; Fizzotti, F.; Foulon, F.; Friedl, M.; Gan, K.K.; Gheeraert, E.; Grigoriev, E.; Hallewell, G.; Hall-Wilton, R.; Han, S.; Hartjes, F.; Hrubec, J.; Husson, D.; Kagan, H.; Kania, D.; Kaplon, J.; Karl, C.; Kass, R.; Knoepfle, K.T.; Krammer, M.; Logiudice, A.; Lu, R.; Manfredi, P.F.; Manfredotti, C.; Marshall, R.D.; Meier, D.; Mishina, M.; Oh, A.; Pan, L.S.; Palmieri, V.G.; Pernicka, M.; Peitz, A.; Pirollo, S.; Polesello, P.; Pretzl, K.; Procario, M.; Re, V.; Riester, J.L.; Roe, S.; Roff, D.; Rudge, A.; Runolfsson, O.; Russ, J.; Schnetzer, S.; Sciortino, S.; Speziali, V.; Stelzer, H.; Stone, R.; Suter, B.; Tapper, R.J.; Tesarek, R.; Trawick, M.; Trischuk, W.; Vittone, E.; Wagner, A.; Walsh, A.M.; Weilhammer, P.; White, C.; Zeuner, W.; Ziock, H.; Zoeller, M.; Blanquart, L.; Breugnion, P.; Charles, E.; Ciocio, A.; Clemens, J.C.; Dao, K.; Einsweiler, K.; Fasching, D.; Fischer, P.; Joshi, A.; Keil, M.; Klasen, V.; Kleinfelder, S.; Laugier, D.; Meuser, S.; Milgrome, O.; Mouthuy, T.; Richardson, J.; Sinervo, P.; Treis, J.; Wermes, N

    1999-08-01

    This paper reviews the development of CVD diamond pixel detectors. The preparation of the diamond pixel sensors for bump-bonding to the pixel readout electronics for the LHC and the results from beam tests carried out at CERN are described.

  11. Electric field enhancement at multiple densities in laser-irradiated nanotube plasma

    Indian Academy of Sciences (India)

    U Chakravarty; P A Naik; P D Gupta

    2012-09-01

    The electric field enhancement inside a nanotube irradiated by intense ultrashort laser pulse ($\\ll 1$ ps) is calculated. The hollowness of the nanotubes determines the field enhancement and the electron density at which such structures exhibit resonance. The electric field in a nanotube plasma is shown to be resonantly enhanced at multiple densities during the two phases of interaction: the ionization phase and the hydrodynamic expansion phase. It is further shown that by a proper choice of hollowness of the nanotubes, a continued occurrence of the resonance over a longer time can be achieved. These properties make nanotubes efficient absorbers of intense ultrashort laser pulses.

  12. Enhancement of Fluorescence-Based Sandwich Immunoassay Using Multilayered Microplates Modified with Plasma-Polymerized Films

    Directory of Open Access Journals (Sweden)

    Kazuyoshi Yano

    2016-12-01

    Full Text Available A functional modification of the surface of a 96-well microplate coupled with a thin layer deposition technique is demonstrated for enhanced fluorescence-based sandwich immunoassays. The plasma polymerization technique enabling the deposition of organic thin films was employed for the modification of the well surface of a microplate. A silver layer and a plasma-polymerized film were consecutively deposited on the microplate as a metal mirror and the optical interference layer, respectively. When Cy3-labeled antibody was applied to the wells of the resulting multilayered microplate without any immobilization step, greatly enhanced fluorescence was observed compared with that obtained with the unmodified one. The same effect could be also exhibited for an immunoassay targeting antigen directly adsorbed on the multilayered microplate. Furthermore, a sandwich immunoassay for the detection of interleukin 2 (IL-2 was performed with the multilayered microplates, resulting in specific and 88-fold–enhanced fluorescence detection.

  13. Enhancement of plasma illumination characteristics of few-layer graphene-diamond nanorods hybrid

    Science.gov (United States)

    Jothiramalingam Sankaran, Kamatchi; Yeh, Chien-Jui; Drijkoningen, Sien; Pobedinskas, Paulius; Van Bael, Marlies K.; Leou, Keh-Chyang; Lin, I.-Nan; Haenen, Ken

    2017-02-01

    Few-layer graphene (FLG) was catalytically formed on vertically aligned diamond nanorods (DNRs) by a high temperature annealing process. The presence of 4-5 layers of FLG on DNRs was confirmed by transmission electron microscopic studies. It enhances the field electron emission (FEE) behavior of the DNRs. The FLG-DNRs show excellent FEE characteristics with a low turn-on field of 4.21 V μm-1 and a large field enhancement factor of 3480. Moreover, using FLG-DNRs as cathode markedly enhances the plasma illumination behavior of a microplasma device, viz not only the plasma current density is increased, but also the robustness of the devices is improved.

  14. A saw-tooth plasma actuator for film cooling efficiency enhancement of a shaped hole

    Science.gov (United States)

    Li, Guozhan; Yu, Jianyang; Liu, Huaping; Chen, Fu; Song, Yanping

    2017-08-01

    This paper reports the large eddy simulations of the effects of a saw-tooth plasma actuator and the laidback fan-shaped hole on the film cooling flow characteristics, and the numerical results are compared with a corresponding standard configuration (cylindrical hole without the saw-tooth plasma actuator). For this numerical research, the saw-tooth plasma actuator is installed just downstream of the cooling hole and a phenomenological plasma model is employed to provide the 3D plasma force vectors. The results show that thanks to the downward force and the momentum injection effect of the saw-tooth plasma actuator, the cold jet comes closer to the wall surface and extends further downstream. The saw-tooth plasma actuator also induces a new pair of vortex which weakens the strength of the counter-rotating vortex pair (CRVP) and entrains the coolant towards the wall, and thus the diffusion of the cold jet in the crossflow is suppressed. Furthermore, the laidback fan-shaped hole reduces the vertical jet velocity causing the disappearance of downstream spiral separation node vortices, this compensates for the deficiency of the saw-tooth plasma actuator. Both effects of the laidback fan-shaped hole and the saw-tooth plasma actuator effectively control the development of the CRVP whose size and strength are smaller than those of the anti-counter rotating vortex pair in the far field, thus the centerline and the spanwise-averaged film cooling efficiency are enhanced. The average film cooling efficiency is the biggest in the Fan-Dc = 1 case, which is 80% bigger than that in the Fan-Dc = 0 case and 288% bigger than that in the Cyl-Dc = 0 case.

  15. Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF{sub 6} based plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Perros, Alexander; Bosund, Markus; Sajavaara, Timo; Laitinen, Mikko; Sainiemi, Lauri; Huhtio, Teppo; Lipsanen, Harri [Department of Micro- and Nanosciences, Aalto University School of Electrical Engineering, P.O. Box 13500, FI-00076 Aalto (Finland); Department of Physics, University of Jyvaeskylae, P.O. Box 35, 40014, Jyvaeskylae,Finland (Finland); Department of Micro and Nanosciences, School of Electrical Engineering, Aalto University, P.O. Box 13500, FI-00076, Aalto (Finland)

    2012-01-15

    The plasma etch characteristics of aluminum nitride (AlN) deposited by low-temperature, 200 deg. C, plasma enhanced atomic layer deposition (PEALD) was investigated for reactive ion etch (RIE) and inductively coupled plasma-reactive ion etch (ICP-RIE) systems using various mixtures of SF{sub 6} and O{sub 2} under different etch conditions. During RIE, the film exhibits good mask properties with etch rates below 10r nm/min. For ICP-RIE processes, the film exhibits exceptionally low etch rates in the subnanometer region with lower platen power. The AlN film's removal occurred through physical mechanisms; consequently, rf power and chamber pressure were the most significant parameters in PEALD AlN film removal because the film was inert to the SF{sub x}{sup +} and O{sup +} chemistries. The etch experiments showed the film to be a resilient masking material. This makes it an attractive candidate for use as an etch mask in demanding SF{sub 6} based plasma etch applications, such as through-wafer etching, or when oxide films are not suitable.

  16. Towards Enhanced Performance Thin-film Composite Membranes via Surface Plasma Modification

    Science.gov (United States)

    Reis, Rackel; Dumée, Ludovic F.; Tardy, Blaise L.; Dagastine, Raymond; Orbell, John D.; Schutz, Jürg A.; Duke, Mikel C.

    2016-07-01

    Advancing the design of thin-film composite membrane surfaces is one of the most promising pathways to deal with treating varying water qualities and increase their long-term stability and permeability. Although plasma technologies have been explored for surface modification of bulk micro and ultrafiltration membrane materials, the modification of thin film composite membranes is yet to be systematically investigated. Here, the performance of commercial thin-film composite desalination membranes has been significantly enhanced by rapid and facile, low pressure, argon plasma activation. Pressure driven water desalination tests showed that at low power density, flux was improved by 22% without compromising salt rejection. Various plasma durations and excitation powers have been systematically evaluated to assess the impact of plasma glow reactions on the physico-chemical properties of these materials associated with permeability. With increasing power density, plasma treatment enhanced the hydrophilicity of the surfaces, where water contact angles decreasing by 70% were strongly correlated with increased negative charge and smooth uniform surface morphology. These results highlight a versatile chemical modification technique for post-treatment of commercial membrane products that provides uniform morphology and chemically altered surface properties.

  17. Increased plasma levels of Lp(a) enhance the development of coronary atherosclerosis

    Institute of Scientific and Technical Information of China (English)

    LI Ying; XU Hong; ZHOU Qin; WANG Chang-yuan; LIU Yan-xia; LU Yuan-yuan; FAN Jiang-lin; SUN Hui-jun

    2008-01-01

    Objective To test the hypothesis that increased plasma levels of Lp(a) may enhance the development of atherosclerosis in the setting of hypercholesterolemia. Methods The plasma Lp(a) was analyzed by SDS-PAGE Western blotting and quantitated using specific ELISA kits. Plasma total cholesterol, triglycerides and HDL-cholesterol were determined using Wako assay kits. The left coronary artery was used for the evaluation of coronary atherosclerosis (stenosis %). For quantitative study of the lesions in coronary atherosclerosis, hematoxylin- eosin and Elastica - van Gieson staining were used. To study cellular components ( SMC vs. macrophages) and Lp(a) deposits in the lesions, immunohistochemical staining was performed and then image analysis system was used. Results Plasma total cholesterol, triglycerides, or HDL-C were not significantly different between transgenic (Trg) and nontransgenic (nonTrg) rabbits. Trg rabbits had 200 % increase in coronary stenosis caused by atherosclerosis. The lesions of Trg WHHL rabbits contained more SMCs and less macrophage than those of nonTrg WHHL rabbits. Conclusions The results suggest that increased plasma levels of Lp(a) enhance the development of coronary atherosclerosis.

  18. Plasma nano-modification of poly(ethylene terephthalate) fabric for pigment adhesion enhancement.

    Science.gov (United States)

    Pransilp, Porntepin; Kiatkamjornwong, Suda; Bhanthumnavin, Worawan; Paosawatyanyong, Boonchoat

    2012-01-01

    Poly(ethylene terephthalate) (PET) fabrics were modified by treating with radio frequency (RF) plasma of different gases, including argon (Ar), nitrogen (N2), oxygen (O2) and sulfur hexafluoride (SF6), under varied power (50-150 watt) and time period (0.5-20 min). Observations indicated that plasma has affected the morphology and roughness of PET fiber surface in the nano-scale level. After plasma treatment, test patterns were printed by inkjet printer directly onto the sample surface. The enhancement of color printing performance on PET fabric by plasma treatment was evaluated by color spectroscopy. The surface nano-modified PET fabrics by Ar, N2, O2, and SF6 plasmas all exhibited enhanced color yield. AFM, SEM, FTIR-ATR and XPS results suggested that the improved pigment color yield was neither clearly contributed by the wettability of the fabrics nor the polar group induced onto the fiber surfaces but rather mainly by the alteration of surface roughness.

  19. Rice (Oryza sativa L.) Seed Sterilization and Germination Enhancement via Atmospheric Hybrid Nonthermal Discharge Plasma.

    Science.gov (United States)

    Khamsen, Natthaporn; Onwimol, Damrongvudhi; Teerakawanich, Nithiphat; Dechanupaprittha, Sanchai; Kanokbannakorn, Weerawoot; Hongesombut, Komsan; Srisonphan, Siwapon

    2016-08-01

    We designed a system to produce atmospheric hybrid cold-discharge plasma (HCP) based on microcorona discharge on a single dielectric barrier and applied it to inactivate microorganisms that commonly attach the rice seed husk. The cold-plasma treatment modified the surface of the rice seeds, resulting in accelerated germination and enhanced water imbibition. The treatment can operate under air-based ambient conditions without the need for a vacuum. The cold-plasma treatment completely inactivated pathogenic fungi and other microorganisms, enhancing the germination percentage and seedling quality. The final germination percentage of the treated rice seeds was ∼98%, whereas that of the nontreated seeds was ∼90%. Microcorona discharge on a single dielectric barrier provides a nonaggressive cold plasma that can be applied to organic materials without causing thermal and electrical damage. The hybrid nonthermal plasma is cost effective and consumes relatively little power, making it suitable for the surface sterilization and disinfection of organic and biological materials with large-scale compatibility.

  20. Vitamin C Pretreatment Enhances the Antibacterial Effect of Cold Atmospheric Plasma

    DEFF Research Database (Denmark)

    Helgadottir, Saga; Pandit, Santosh; Mokkapati, Venkata R. S. S.

    2017-01-01

    for pathogenic bacteria. Cold Atmospheric Plasma (CAP) is known to be quite efficient in eradicating planktonic bacteria, but its effectiveness against biofilms has not been thoroughly investigated. The goal of this study was to evaluate the effect of exposure of CAP against mature biofilm for different time...... are pre-treated with vitamin C for 15 min before exposure to CAP, a significantly stronger bactericidal effect can be obtained. Vitamin C pretreatment enhances the bactericidal effect of cold plasma by reducing the viability from 10 to 2% in E. coli biofilm, 50 to 11% in P. aeruginosa, and 61 to 18% in S...

  1. Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    XUJun,GAOPeng; DINGWan-yu; LIXin; DENGXin-lu; DONGChuang

    2004-01-01

    Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transtorm infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C-N type.

  2. The impact of individualised cardiovascular disease (CVD risk estimates and lifestyle advice on physical activity in individuals at high risk of CVD: a pilot 2 × 2 factorial understanding risk trial

    Directory of Open Access Journals (Sweden)

    Griffin Simon J

    2008-07-01

    Full Text Available Abstract Background There is currently much interest in encouraging individuals to increase physical activity in order to reduce CVD risk. This study has been designed to determine if personalised CVD risk appreciation can increase physical activity in adults at high risk of CVD. Methods/Design In a 2 × 2 factorial design participants are allocated at random to a personalised 10-year CVD risk estimate or numerical CVD risk factor values (systolic blood pressure, LDL cholesterol and fasting glucose and, simultaneously, to receive a brief lifestyle advice intervention targeting physical activity, diet and smoking cessation or not. We aim to recruit 200 participants from Oxfordshire primary care practices. Eligibility criteria include adults age 40–70 years, estimated 10-year CVD risk ≥20%, ability to read and write English, no known CVD and no physical disability or other condition reducing the ability to walk. Primary outcome is physical activity measured by ActiGraph accelerometer with biochemical, anthropometrical and psychological measures as additional outcomes. Primary analysis is between group physical activity differences at one month powered to detect a difference of 30,000 total counts per day of physical activity between the groups. Additional analyses will seek to further elucidate the relationship between the provision of risk information, and intention to change behaviour and to determine the impact of both interventions on clinical and anthropometrical measures including fasting and 2 hour plasma glucose, fructosamine, serum cotinine, plasma vitamin C, body fat percentage and blood pressure. Discussion This is a pilot trial seeking to demonstrate in a real world setting, proof of principal that provision of personalised risk information can contribute to behaviour changes aimed at reducing CVD risk. This study will increase our understanding of the links between the provision of risk information and behaviour change and if

  3. Lipids, atherosclerosis and CVD risk: is CRP an innocent bystander?

    DEFF Research Database (Denmark)

    Nordestgaard, B G; Zacho, J

    2009-01-01

    exclude that genetically elevated CRP cause CVD. CONCLUSION: These data suggest that elevated CRP per se does not cause CVD; however, inflammation per se possibly contributes to CVD. Elevated CRP levels more likely is a marker for the extent of atherosclerosis or for the inflammatory activity...

  4. Application of surface-enhanced Raman in skin cancer by plasma

    Science.gov (United States)

    Yin, W. Z.; Guo, Z. Y.; Zhuang, Z. F.; Liu, S. H.; Xiong, K.; Chen, S. J.

    2012-05-01

    We have developed a mouse squamous cell carcinomas (SCC) model by diniethylbenzanthracene (DMBA) and ultraviolet (UVB). A silver colloid as SERS-active substrates is used for detecting the blood plasma of mouse. The relative intensity of the band at 942 and 1499 cm-1 is higher in SCC model than in healthy one. Therefore, it can be used as an important "fingerprint" in order to diagnose these diseases. Results show us how to get high signal-to-noise ratio of biological macromolecules surface-enhanced Raman scattering spectra in blood plasma. And also offer useful help for understanding the rich molecular structure information in biological tissues. It provides a molecular spectroscopy way for early detection of disease in blood plasma.

  5. Plasma-enhanced chemical vapor deposition of amorphous Si on graphene

    Science.gov (United States)

    Lupina, G.; Strobel, C.; Dabrowski, J.; Lippert, G.; Kitzmann, J.; Krause, H. M.; Wenger, Ch.; Lukosius, M.; Wolff, A.; Albert, M.; Bartha, J. W.

    2016-05-01

    Plasma-enhanced chemical vapor deposition of thin a-Si:H layers on transferred large area graphene is investigated. Radio frequency (RF, 13.56 MHz) and very high frequency (VHF, 140 MHz) plasma processes are compared. Both methods provide conformal coating of graphene with Si layers as thin as 20 nm without any additional seed layer. The RF plasma process results in amorphization of the graphene layer. In contrast, the VHF process keeps the high crystalline quality of the graphene layer almost intact. Correlation analysis of Raman 2D and G band positions indicates that Si deposition induces reduction of the initial doping in graphene and an increase of compressive strain. Upon rapid thermal annealing, the amorphous Si layer undergoes dehydrogenation and transformation into a polycrystalline film, whereby a high crystalline quality of graphene is preserved.

  6. Influence of ion species ratio on grid-enhanced plasma source ion implantation

    Institute of Scientific and Technical Information of China (English)

    Wang Jiu-Li; Zhang Gu-Ling; Liu Yuan-Fu; Wang You-Nian; Liu Chi-Zi; Yang Si-Ze

    2004-01-01

    @@ Grid-enhanced plasma source ion implantation (GEPSII) is a newly proposed technique to modify the inner-surface properties of a cylindrical bore. In this paper, a two-ion fluid model describing nitrogen molecular ions N2+ and atomic ions N+ is used to investigate the ion sheath dynamics between the grid electrode and the inner surface of a cylindrical bore during the GEPSII process, which is an extension of our previous calculations in which only N2+ was considered.Calculations are concentrated on the results of ion dose and impact energy on the target for different ion species ratios in the core plasma. The calculated results show that more atomic ions N+ in the core plasma can raise the ion impact energy and reduce the ion dose on the target.

  7. Study of the triton-burnup process in different JET scenarios using neutron monitor based on CVD diamond

    Science.gov (United States)

    Nemtsev, G.; Amosov, V.; Meshchaninov, S.; Popovichev, S.; Rodionov, R.

    2016-11-01

    We present the results of analysis of triton burn-up process using the data from diamond detector. Neutron monitor based on CVD diamond was installed in JET torus hall close to the plasma center. We measure the part of 14 MeV neutrons in scenarios where plasma current varies in a range of 1-3 MA. In this experiment diamond neutron monitor was also able to detect strong gamma bursts produced by runaway electrons arising during the disruptions. We can conclude that CVD diamond detector will contribute to the study of fast particles confinement and help predict the disruption events in future tokamaks.

  8. Enhancement of the power supply systems in RFX-mod towards 2 MA plasma current

    Energy Technology Data Exchange (ETDEWEB)

    Novello, Luca, E-mail: luca.novello@igi.cnr.it [Consorzio RFX, Euratom-ENEA Association, Padova (Italy); Zamengo, Andrea; Ferro, Alberto; Zanotto, Loris; Barp, Marco; Cavazzana, Roberto; Finotti, Claudio; Recchia, Mauro; Gaio, Elena [Consorzio RFX, Euratom-ENEA Association, Padova (Italy)

    2011-10-15

    The recent start-up improvements brought to RFX-mod have allowed increasing the plasma current in the range 1.7-1.9 MA, but still they proved to be not sufficient to routinely and reliably reach higher values of plasma current that would be very useful for the present studies on enhanced confinement. The need for higher poloidal flux variation together with the overabundant available toroidal flux has led to the study of a rearrangement of the power supply system with the aim of increasing the first at the expenses of the latter. Thanks to the flexibility of the power supply system, composed of modular thyristor converters, the rearrangement has been easily obtained and the resulting enhanced poloidal flux capability scenario described in the paper allows a two step plasma current ramp-up. In order to increase as much as possible the plasma current up to the nominal value of 2 MA it is necessary to fully exploit the thyristor converter power capability, in particular in the first ramp-up phase. In the paper a detailed verification of their maximum performance is presented. The first results obtained after power supply reconfiguration are very good, with plasma current kept constant at about 2 MA for 100 ms. The enabled operation at very high plasma current requires also an optimization of the magneto hydro dynamics (MHD) mode coil power supplies that are required to provide higher current values. Therefore a dedicated study of their control system has been worked out, which allowed understanding how to increase as much as possible the output current without losing the dynamic performance, so keeping the efficiency in the control of dominant and secondary modes, which is essential to obtain good and reproducible discharges.

  9. Enhanced Biological Behavior of In Vitro Human Gingival Fibroblasts on Cold Plasma-Treated Zirconia.

    Directory of Open Access Journals (Sweden)

    Miao Zheng

    Full Text Available To evaluate whether atmospheric-pressure dielectric-barrier-discharge plasma treatment of zirconia enhances its biocompatibility with human gingival fibroblasts.The zirconia disks were divided into four groups and treated using helium atmospheric-pressure dielectric-barrier-discharge plasmas for 30, 60 or 90 s or left untreated. The surface morphology, wettability and chemical elements were analyzed. Fibroblasts density, morphology, morphometry and attachment-related genes expression were measured at different time points from 3 to 72 h.After plasma treatment, the surface morphology and roughness remained the same, while the contact angle decreased from 78.31° to 43.71°, and the surface C/O ratio decreased from 3.17 to 0.89. The surficial areas and perimeters of HGFs were increased two-fold in the treated groups at 3 h. Fibroblasts density increased on treated disks at all time points, especially the ones treated for 60 s. Attachment-related genes in the groups treated for 30 and 60 s were significantly higher at 3 and 24 h.The helium atmospheric-pressure dielectric-barrier-discharge plasma treatment enhances the biological behavior of fibroblasts on zirconia by increasing the expression of attachment-related genes within 24 h and promoting the cell density during longer culture times. Wettability of zirconia, an important physicochemical property, has a vital influence on the cell behaviors.

  10. Deposition and Coating Properties on CVD Tungsten

    Institute of Scientific and Technical Information of China (English)

    DU Ji-hong; LI Zheng-xiang; LIU Gao-jian; ZHOU Hui-Huang; CHUN liang

    2004-01-01

    Surface characterization and microstructure studies are performed on chemical vapor deposited (CVD) tungsten coating. There is about 2 μm thickness diffusion layer of tungsten in the molybdenum substrate. The thermal shock test shows tungsten coating has good adhesion with molybdenum substrate, but the elements of oxygen and carbon in the tungsten coating have the bad affection to the adhesion. The result of high-temperature diffusion experiment is the diffusion rate from molybdenum substrate to tungsten coating is faster.

  11. Enhanced thermoelectric performance of spark plasma sintered copper-deficient nanostructured copper selenide

    Science.gov (United States)

    Tyagi, Kriti; Gahtori, Bhasker; Bathula, Sivaiah; Jayasimhadri, M.; Singh, Niraj Kumar; Sharma, Sakshi; Haranath, D.; Srivastava, A. K.; Dhar, Ajay

    2015-06-01

    We report the thermoelectric properties of nanostructured Cu-deficient Cu2Se, which was synthesized by high energy ball milling followed by spark plasma sintering. Our method obtained a significant enhancement in the thermoelectric figure of merit (ZT), i.e., ~1.4 at 973 K, which was ~30% higher than its bulk counterpart. This enhancement in the thermoelectric performance was due mainly to a significant reduction in the lattice thermal conductivity, which was attributed to enhanced phonon scattering at various length scales by nanoscale defects as well as abundant nanograin boundaries. The nanoscale defects were characterized by transmission electron microscopy of the nanostructured Cu2-xSe samples, which formed the basis of the ZT enhancement.

  12. Plasma-Enhanced Chemical Vapor Deposition as a Method for the Deposition of Peptide Nanotubes

    Science.gov (United States)

    2013-09-17

    peptide nanotubes, plasma-enhanced chemical vapor deposition, nano assembly 16. SECURITY CLASSIFICATION OF: 17. LIMITATION OF ABSTRACT SAR 18...Using physical vapor deposition ( PVD ) well-ordered assemblies of peptide nanotubes (PNTs) composed of dipeptide subunits are obtained on various...for the deposition of thin films (Figure 1b). A. B. Figure 1. (a) Illustration of physical vapor deposition ( PVD ) process of diphenylalanine

  13. Laser plasma wakefield acceleration gain enhancement by means of accelerating Bessel pulses

    Science.gov (United States)

    Kumar, S.; Parola, A.; Di Trapani, P.; Jedrkiewicz, O.

    2017-06-01

    In this paper, we propose an approach to enhance the electron energy gain in standard laser-driven plasma wakefield accelerators, using accelerating Bessel pulses with tunable group velocity so to avoid electron dephasing. We use in the numerical simulations a one-dimensional theoretical model in the linear regime, taking advantage of the "diffraction-free" properties of the localized Bessel beam and thus neglecting transverse effects during the acceleration process. With a multistage tailoring approach, we show a gain enhancement of more than 100 with electron energies that may reach the GeV range over distances shorter than 1 m.

  14. Plasma-enhanced synthesis of bactericidal quaternary ammonium thin layers on stainless steel and cellulose surfaces.

    Science.gov (United States)

    Jampala, Soujanya N; Sarmadi, M; Somers, E B; Wong, A C L; Denes, F S

    2008-08-19

    We have investigated bottom-up chemical synthesis of quaternary ammonium (QA) groups exhibiting antibacterial properties on stainless steel (SS) and filter paper surfaces via nonequilibrium, low-pressure plasma-enhanced functionalization. Ethylenediamine (ED) plasma under suitable conditions generated films rich in secondary and tertiary amines. These functional structures were covalently attached to the SS surface by treating SS with O 2 and hexamethyldisiloxane plasma prior to ED plasma treatment. QA structures were formed by reaction of the plasma-deposited amines with hexyl bromide and subsequently with methyl iodide. Structural compositions were examined by electron spectroscopy for chemical analysis and Fourier transform infrared spectroscopy, and surface topography was investigated with atomic force microscopy and water contact angle measurements. Modified SS surfaces exhibited greater than a 99.9% decrease in Staphylococcus aureus counts and 98% in the case of Klebsiella pneumoniae. The porous filter paper surfaces with immobilized QA groups inactivated 98.7% and 96.8% of S. aureus and K. pneumoniae, respectively. This technique will open up a novel way for the synthesis of stable and very efficient bactericidal surfaces with potential applications in development of advanced medical devices and implants with antimicrobial surfaces.

  15. Enhanced Hydrophilicity and Biocompatibility of Dental Zirconia Ceramics by Oxygen Plasma Treatment

    Directory of Open Access Journals (Sweden)

    Ching-Chou Wu

    2015-02-01

    Full Text Available Surface properties play a critical role in influencing cell responses to a biomaterial. The objectives of this study were (1 to characterize changes in surface properties of zirconia (ZrO2 ceramic after oxygen plasma treatment; and (2 to determine the effect of such changes on biological responses of human osteoblast-like cells (MG63. The results indicated that the surface morphology was not changed by oxygen plasma treatment. In contrast, oxygen plasma treatment to ZrO2 not only resulted in an increase in hydrophilicity, but also it retained surface hydrophilicity after 5-min treatment time. More importantly, surface properties of ZrO2 modified by oxygen plasma treatment were beneficial for cell growth, whereas the surface roughness of the materials did not have a significant efficacy. It is concluded that oxygen plasma treatment was certified to be effective in modifying the surface state of ZrO2 and has the potential in the creation and maintenance of hydrophilic surfaces and the enhancement of cell proliferation and differentiation.

  16. Plasma-enhanced synthesis of surfaces that kill bacteria on contact

    Science.gov (United States)

    Jampala, Soujanya Naga

    High incidences of microbial contamination and infections are a major concern in all existing and evolving technologies of medicine and biology. The propensity towards infections is directly related to bacterial colonization and biofilms on surfaces. This dissertation presents the development of surfaces that can kill bacteria on contact by using cold plasma technology. Quaternary ammonium (QA) groups are known to exhibit antibacterial characteristics in water-based environments. To overcome the limitations of residual toxicity, alternative strategies involving covalent attachment of QA groups to metallic and cellulosic surfaces have been developed. Low pressure, non-equilibrium plasma-enhanced functionalization and subsequent ex situ chemical reactions were designed for step-by-step "bottom-up" chemical synthesis of QA groups covalently anchored to surfaces. The plasma processes under selected discharge parameters generated structure- and functionality-controlled crosslinked networks of macromolecular layers with high concentrations of reactive amine groups. Subsequent derivatization of the plasma-deposited films with alkyl halides yielded surface-bound QA groups rendering surfaces with high bactericidal efficacy against Gram-positive Staphylococcus aureus and Gram-negative Klebsiella pneumoniae. Stainless steel and cotton surfaces sequentially treated with ethylene diamine plasma, n-hexyl bromide and methyl iodide exhibited at least 99.9% and 98% kill of S. aureus and K. pneumoniae respectively. The influence of chemical architecture of QA groups with different alkyl substituents on the efficacy of bactericidal surfaces was quantified. Results from this work will permit the development of novel plasma-aided technologies for the synthesis of antibacterial surfaces with potential biomedical applications. The cold plasma approach can be used on any solid material surfaces including polymers, metals, ceramics and semiconductors.

  17. Plasma treated polyethylene grafted with adhesive molecules for enhanced adhesion and growth of fibroblasts

    Energy Technology Data Exchange (ETDEWEB)

    Rimpelová, Silvie [Department of Biochemistry and Microbiology, Institute of Chemical Technology, Prague, Technická 5, Prague 6, 166 28 (Czech Republic); Kasálková, Nikola Slepičková; Slepička, Petr [Department of Solid State Engineering, Institute of Chemical Technology, Prague, Technická 5, Prague 6, 166 28 (Czech Republic); Lemerová, Helena [Department of Biochemistry and Microbiology, Institute of Chemical Technology, Prague, Technická 5, Prague 6, 166 28 (Czech Republic); Švorčík, Václav [Department of Solid State Engineering, Institute of Chemical Technology, Prague, Technická 5, Prague 6, 166 28 (Czech Republic); Ruml, Tomáš, E-mail: tomas.ruml@vscht.cz [Department of Biochemistry and Microbiology, Institute of Chemical Technology, Prague, Technická 5, Prague 6, 166 28 (Czech Republic)

    2013-04-01

    The cell–material interface plays a crucial role in the interaction of cells with synthetic materials for biomedical use. The application of plasma for tailoring polymer surfaces is of abiding interest and holds a great promise in biomedicine. In this paper, we describe polyethylene (PE) surface tuning by Ar plasma irradiating and subsequent grafting of the chemically active PE surface with adhesive proteins or motives to support cell attachment. These simple modifications resulted in changed polymer surface hydrophilicity, roughness and morphology, which we thoroughly characterized. The effect of our modifications on adhesion and growth was tested in vitro using mouse embryonic fibroblasts (NIH 3T3 cell line). We demonstrate that the plasma treatment of PE had a positive effect on the adhesion, spreading, homogeneity of distribution and moderately on proliferation activity of NIH 3T3 cells. This effect was even more pronounced on PE coated with biomolecules. - Graphical abstract: High density polyethylene scaffolds (PE) were modified by deposition to Ar plasma. These surface reactive PE were further grafted with biomolecules to enhance cell attachment and proliferation. The changes in surface physico-chemical properties (hydrophilicity, morphology, roughness) of PE were measured. The effects of used substrates on the adhesion and growth of mouse embryonic fibroblasts were determined by a five-day cell culture study. The method for significant biocompatibility improvement was presented. Highlights: ► Argon plasma treatment altered polyethylene surface morphology and roughness ► Plasma treatment reduced contact angle of polyethylene ► Grafting of polyethylene with biomolecules further reduced contact angle ► Plasma treatment and peptide grafting increased polyethylene biocompatibility.

  18. Oxide Dispersion Strengthened Iron Aluminide by CVD Coated Powders

    Energy Technology Data Exchange (ETDEWEB)

    Asit Biswas Andrew J. Sherman

    2006-09-25

    This I &I Category2 program developed chemical vapor deposition (CVD) of iron, aluminum and aluminum oxide coated iron powders and the availability of high temperature oxidation, corrosion and erosion resistant coating for future power generation equipment and can be used for retrofitting existing fossil-fired power plant equipment. This coating will provide enhanced life and performance of Coal-Fired Boilers components such as fire side corrosion on the outer diameter (OD) of the water wall and superheater tubing as well as on the inner diameter (ID) and OD of larger diameter headers. The program also developed a manufacturing route for readily available thermal spray powders for iron aluminide coating and fabrication of net shape component by powder metallurgy route using this CVD coated powders. This coating can also be applid on jet engine compressor blade and housing, industrial heat treating furnace fixtures, magnetic electronic parts, heating element, piping and tubing for fossil energy application and automotive application, chemical processing equipment , heat exchanger, and structural member of aircraft. The program also resulted in developing a new fabrication route of thermal spray coating and oxide dispersion strengthened (ODS) iron aluminide composites enabling more precise control over material microstructures.

  19. Effect of current stress during thermal CVD of multilayer graphene on cobalt catalytic layer

    Science.gov (United States)

    Ueno, Kazuyoshi; Ichikawa, Hiroyasu; Uchida, Takaki

    2016-04-01

    To improve the crystallinity of multilayer graphene (MLG) by CVD at a low temperature, the effect of current stress during thermal CVD on a cobalt (Co) catalytic layer was investigated. The crystallinity of MLG obtained by CVD with current was higher than that without current at the same temperature. This indicates that current has effects besides the Joule heating effect. The current effects on the Co catalytic layer and the MLG growth reaction were investigated, and it was found that current had small effects on the grain size and crystal structure of the Co catalyst and large effects on the MLG growth reaction such as large grain growth and a low activation energy of 0.49 eV, which is close to the value reported for carbon surface diffusion on Co. It is considered that the enhancement of MLG growth reaction by current leads to the improved crystallinity of MLG at a relatively low temperature.

  20. Effect of plasma parameters on characteristics of silicon nitride film deposited by single and dual frequency plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Sahu, B. B.; Yin, Yongyi; Han, Jeon G.

    2016-03-01

    This work investigates the deposition of hydrogenated amorphous silicon nitride films using various low-temperature plasmas. Utilizing radio-frequency (RF, 13.56 MHz) and ultra-high frequency (UHF, 320 MHz) powers, different plasma enhanced chemical vapor deposition processes are conducted in the mixture of reactive N2/NH3/SiH4 gases. The processes are extensively characterized using different plasma diagnostic tools to study their plasma and radical generation capabilities. A typical transition of the electron energy distribution function from single- to bi-Maxwellian type is achieved by combining RF and ultra-high powers. Data analysis revealed that the RF/UHF dual frequency power enhances the plasma surface heating and produces hot electron population with relatively low electron temperature and high plasma density. Using various film analysis methods, we have investigated the role of plasma parameters on the compositional, structural, and optical properties of the deposited films to optimize the process conditions. The presented results show that the dual frequency power is effective for enhancing dissociation and ionization of neutrals, which in turn helps in enabling high deposition rate and improving film properties.

  1. Abnormal Crystallization of Silicon Thin Films Deposited by ICP-CVD

    Institute of Scientific and Technical Information of China (English)

    LI Jun-Shuai; YIN Min; WANG Jin-Xiao; HE De-Yan

    2005-01-01

    @@ Silicon thin films are deposited by inductively coupled plasma chemical vapour deposition (ICP-CVD) at a low temperature of 350℃ using a mixture of SiH4 and H2. The structures of the films are characterized by x-ray diffraction and Raman spectra. Under the optimum experimental conditions, we observe that the crystallinity of Si films becomes more excellent and the preferred orientation changes from (111) to (220) with the decreasing dilution of SiH4 in H2. Such an abnormal crystallization is tentatively interpreted in term of the high density,low electron temperature and spatial confinement of the plasma in the process of ICP-CVD.

  2. Enhancement of corrosion resistance for plasma nitrided AISI 4140 steel by plain air plasma post-oxidizing

    Energy Technology Data Exchange (ETDEWEB)

    Wu, Jiqiang; Liu, Han; Ye, Xuemei [Jiangsu Key Laboratory of Materials Surface Technology, Changzhou University, Changzhou 213164 (China); Chai, Yating [Materials Research and Education Center, Auburn University, AL 36849 (United States); Hu, Jing, E-mail: jinghoo@126.com [Jiangsu Key Laboratory of Materials Surface Technology, Changzhou University, Changzhou 213164 (China); Materials Research and Education Center, Auburn University, AL 36849 (United States)

    2015-05-25

    Highlights: • Plain air was primarily used for plasma post-oxidation for AISI 4140 steel. • A thin iron oxide layer composed of Fe{sub 3}O{sub 4} to Fe{sub 2}O{sub 3} was formed on top of the compound layer. • The ratio of Fe{sub 3}O{sub 4} to Fe{sub 2}O{sub 3} was closely related to the post-oxidizing conditions. • Post-oxidizing at 673 K for 60 min brought out highest ratio of Fe{sub 3}O{sub 4} to Fe{sub 2}O{sub 3} and optimum corrosion resistance. - Abstract: Plasma post-oxidizing was conducted immediately after plasma nitriding in the same equipment for AISI 4140 steel, and plain air was used as the oxygen bearing gas. The cross-sectional microstructures of the treated samples were observed by optical metallography and scanning electron microcopy (SEM), and the thickness of compound layer was measured accordingly. The phases were determined by X-ray diffraction (XRD), corrosion resistance was evaluated by electrochemical polarization, and the surface morphology before and after polarization test was also observed by SEM. Meanwhile, standard Gibbs free energy of the oxidation reactions existed in Fe–O system was calculated. The results show that a thin iron oxide layer composed of magnetite (Fe{sub 3}O{sub 4}) and hematite (Fe{sub 2}O{sub 3}) is formed on top of the compound layer during plasma post-oxidizing process, and the ratio of magnetite (Fe{sub 3}O{sub 4}) to hematite (Fe{sub 2}O{sub 3}) is depended on plasma post-oxidizing temperature and time. Highest ratio of Fe{sub 3}O{sub 4} to Fe{sub 2}O{sub 3} is obtained while post-oxidizing at 673 K for 60 min due to lower standard Gibbs free energy and appropriate forming rate for the formation of Fe{sub 3}O{sub 4} at this temperature. The thin oxide layer brings out significant enhancement of corrosion resistance, especially at higher ratios of Fe{sub 3}O{sub 4} to Fe{sub 2}O{sub 3}, due to the dense and adherent characteristic of Fe{sub 3}O{sub 4} oxide. Surface images of the post-oxidizing specimen

  3. 8% Efficient thin-film polycrystalline-silicon solar cells based on aluminium-induced crystallization and thermal CVD

    Energy Technology Data Exchange (ETDEWEB)

    Gordon, I.; Carnel, L.; Van Gestel, D.; Beaucarne, G.; Poortmans, J. [IMEC VZW, Leuven (Belgium)

    2006-07-01

    A considerable cost reduction could be achieved in photovoltaics if efficient solar cells could be made from polycrystalline-silicon (pc-Si) thin films on inexpensive substrates. We recently showed promising solar cells results using pc-Si layers obtained by aluminium-induced crystallization (AlC) of amorphous silicon in combination with thermal chemical vapor deposition (CVD). To obtain highly efficient pc-Si solar cells, however, the material quality has to be optimized and cell processes different from those applied for standard bulk-Si solar cells have to be developed. In this work, we present the different process steps that we recently developed to enhance the efficiency of pc-Si solar cells on alumina substrates made by AlC in combination with thermal CVD. Our present pc-Si solar cell process yields cells in substrate configuration with efficiencies so far of up to 8.0%. Spin-on oxides are used to smoothen the alumina substrate surface to enhance the electronic quality of the absorber layers. The cells have heterojunction emitters consisting of thin a-Si layers that yield much higher V{sub oc} values than classical diffused emitters. Base and emitter contacts are on top of the cell in interdigitated finger patterns, leading to fill factors above 70%. The front surface of the cells is plasma textured to increase the current density. Our present pc-Si solar cell efficiency of 8% together with the fast progression that we have made over the last few years indicate the large potential of pc-Si solar cells based on the AlC seed layer approach. (author)

  4. Enhancement of x-ray yields from heteronuclear cluster plasmas irradiated by intense laser light

    Energy Technology Data Exchange (ETDEWEB)

    Jha, J; Mathur, D; Krishnamurthy, M [Tata Institute of Fundamental Research, 1 Homi Bhabha Road, Mumbai 400 005 (India)

    2005-09-28

    We report a new method to enhance the x-ray emission from nano-cluster plasmas formed upon irradiation by intense femtosecond-duration laser pulses. Our experiments demonstrate that when Ar clusters are doped with H{sub 2}O the time-integrated yield of Ar K x-ray emission is enhanced by approximately 12-fold in comparison to that obtained from pure Ar clusters under otherwise identical experimental conditions. A significant alteration in the time-dependent electron density is achieved by the presence of an H{sub 2}O dopant, and this could be the possible reason for the enhancement that is observed. (letter to the editor)

  5. Plasma induced tungsten doping of TiO2 particles for enhancement of photocatalysis under visible light

    OpenAIRE

    Ishida, Yohei; Motokane, Yasutomo; Tokunaga, Tomoharu; Yonezawa, Tetsu

    2015-01-01

    Here we report a novel method for modifying commercially available TiO2 nanoparticles by a microwave-induced plasma technique. After the plasma treatment TiO2 nanoparticles showed enhanced visible absorption due to the doped W atoms, and the photocatalytic methylene blue degradation above 440 nm was successfully improved.

  6. Plasma induced tungsten doping of TiO2 particles for enhancement of photocatalysis under visible light.

    Science.gov (United States)

    Ishida, Yohei; Motokane, Yasutomo; Tokunaga, Tomoharu; Yonezawa, Tetsu

    2015-10-14

    Here we report a novel method for modifying commercially available TiO2 nanoparticles by a microwave-induced plasma technique. After the plasma treatment TiO2 nanoparticles showed enhanced visible absorption due to the doped W atoms, and the photocatalytic methylene blue degradation above 440 nm was successfully improved.

  7. Effects of Ambient Humidity on Plant Growth Enhancement by Atmospheric Air Plasma Irradiation to Plant Seeds

    Science.gov (United States)

    Sarinont, Thapanut; Amano, Takaaki; Koga, Kazunori; Shiratani, Masaharu

    2015-09-01

    Humidity is an important factor for plasma-bio applications because composition of species generated by atmospheric pressure plasmas significantly depends on the humidity. Here we have examined effects of humidity on the growth enhancement to study the mechanism. Experiments were carried out with a scalable DBD device. 10 seeds of Raphanus sativus L. were set for x = 5 mm and y = 3 mm below the electrodes. The humidity Hair was 10 - 90 %Rh. The ratio of length of plants with plasma irradiation to that of control increases from 1.2 for Hair = 10 %Rh to 2.5 for Hair = 50 %Rh. The ratio is 2.5 for Hair = 50-90 %Rh. This humidity dependence is similar to the humidity dependence of O2+-H2O,H3O*, NO2--H2Oand NO3--H2Odensities, whereas it is different from that of other species such as O3, NO, and so on. The similarity gives information on key species for the growth enhancement.

  8. Laser-guided energetic discharges over large air gaps by electric-field enhanced plasma filaments

    Science.gov (United States)

    Théberge, Francis; Daigle, Jean-François; Kieffer, Jean-Claude; Vidal, François; Châteauneuf , Marc

    2017-01-01

    Recent works on plasma channels produced during the propagation of ultrashort and intense laser pulses in air demonstrated the guiding of electric discharges along the laser path. However, the short plasma lifetime limits the length of the laser-guided discharge. In this paper, the conductivity and lifetime of long plasma channels produced by ultrashort laser pulses is enhanced efficiently over many orders of magnitude by the electric field of a hybrid AC-DC high-voltage source. The AC electric pulse from a Tesla coil allowed to stimulate and maintain the highly conductive channel during few milliseconds in order to guide a subsequent 500 times more energetic discharge from a 30-kV DC source. This DC discharge was laser-guided over an air gap length of two metres, which is more than two orders of magnitude longer than the expected natural discharge length. Long plasma channel induced by laser pulses and stimulated by an external high-voltage source opens the way for wireless and efficient transportation of energetic current pulses over long air gaps and potentially for guiding lightning. PMID:28053312

  9. Polyimide surface modification by using microwave plasma for adhesion enhancement of Cu electroless plating.

    Science.gov (United States)

    Cho, Sang-Jin; Nguyen, Trieu; Boo, Jin-Hyo

    2011-06-01

    Microwave (MW) plasma was applied to the surface of polyimide (PI) films as a treatment to enhance the adhesion between copper deposition layer and PI surface for electroless plating. The influences of nitrogen MW plasma treatment on chemical composition of the PI surface were investigated by using X-Ray photoelectron spectroscopy (XPS). The wettability was also investigated by water contact angle measurement. The surface morphologies of PI films before and after treatment were characterized with atomic force microscopy (AFM). The contact angle results show that was dramatically decreased to 16.1 degrees at the optimal treatment condition from 72.1 degrees (untreated PI). However, the root mean square (RMS) roughness of treated PI film was almost unchanged. The AFM roughness was stayed from 1.0 to 1.2 with/without plasma treatment. XPS data show a nitrogen increase when PI films exposed to N2 MW plasma. Electroless copper depositions were carried out with the free-formaldehyde method using glyoxylic acid as the reducing reagent and mixture palladium chloride, tin chloride as activation solution. Adhesion property between polyimide surface and copper layer was investigated by tape test.

  10. Laser-guided energetic discharges over large air gaps by electric-field enhanced plasma filaments

    Science.gov (United States)

    Théberge, Francis; Daigle, Jean-François; Kieffer, Jean-Claude; Vidal, François; Châteauneuf, Marc

    2017-01-01

    Recent works on plasma channels produced during the propagation of ultrashort and intense laser pulses in air demonstrated the guiding of electric discharges along the laser path. However, the short plasma lifetime limits the length of the laser-guided discharge. In this paper, the conductivity and lifetime of long plasma channels produced by ultrashort laser pulses is enhanced efficiently over many orders of magnitude by the electric field of a hybrid AC-DC high-voltage source. The AC electric pulse from a Tesla coil allowed to stimulate and maintain the highly conductive channel during few milliseconds in order to guide a subsequent 500 times more energetic discharge from a 30-kV DC source. This DC discharge was laser-guided over an air gap length of two metres, which is more than two orders of magnitude longer than the expected natural discharge length. Long plasma channel induced by laser pulses and stimulated by an external high-voltage source opens the way for wireless and efficient transportation of energetic current pulses over long air gaps and potentially for guiding lightning.

  11. Zirconia coatings deposited by novel plasma-enhanced aerosol-gel method

    Energy Technology Data Exchange (ETDEWEB)

    Miszczak, Sebastian; Pietrzyk, Bozena; Kucharski, Daniel [Institute of Materials Science and Engineering, Lodz University of Technology (Poland)

    2016-05-15

    The sol-gel technique is well known and widely used for manufacturing coatings. An aerosol-gel method is a modification of the classic sol-gel process. Preparation of coatings by this technique involves the formation of an aerosol and its deposition on the coated surfaces, where the aerosol droplets merge into a continuous layer. In this work, an aerosol-gel routine, enhanced with a low-temperature plasma discharge, was used to produce zirconia coatings on different substrates. Low-temperature plasma was used for preactivation of substrate surfaces prior to the sol deposition, and for treatment of deposited layers. The obtained coatings were characterized using optical, electron (SEM), and atomic force (AFM) microscopes, a contact-angle device, a scratch tester, a grazing-incidence X-ray diffractometer (GIXRD), and an infrared spectrometer (FTIR). The results showed a significant influence of substrate plasma pretreatment on the formation and morphology of zirconia thin films. A noticeable effect of low-temperature plasma treatment on the structure and properties of the obtained coatings was also presented. These results allow possible applications of this method for the preparation of zirconia coatings on temperature-sensitive substrates to be predicted. (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  12. RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization

    Energy Technology Data Exchange (ETDEWEB)

    Chopade, S.S. [Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai 400085 (India); Nayak, C.; Bhattacharyya, D.; Jha, S.N.; Tokas, R.B.; Sahoo, N.K. [Atomic & Molecular Physics Division, Bhabha Atomic Research Center, Trombay, Mumbai 400085 (India); Deo, M.N. [High Pressure & Synchrotron Radiation Physics Division, Bhabha Atomic Research Center, Trombay, Mumbai 400085 (India); Biswas, A. [Atomic & Molecular Physics Division, Bhabha Atomic Research Center, Trombay, Mumbai 400085 (India); Rai, Sanjay [Indus Synchrotron Utilization Division, RRCAT, Indore 452013 (India); Thulasi Raman, K.H.; Rao, G.M. [Department of Instrumentation and Applied Physics, Indian Institute of Science, Bangalore 560012 (India); Kumar, Niranjan [Indira Gandhi Centre for Atomic Research, Kalpakkam 603102 (India); Patil, D.S., E-mail: dspatil@iitb.ac.in [Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai 400085 (India)

    2015-11-15

    Highlights: • YSZ films are deposited by RF plasma MOCVD using Zr(tod){sub 4} and Y(tod){sub 3} precursors. • Films are deposited under the influence of RF self-bias on the substrates. • Films are characterized by different techniques. • Films properties are dependent on yttria content and film structure. - Abstract: Yttria stabilized zirconia thin films have been deposited by RF plasma enhanced MOCVD technique on silicon substrates at substrate temperature of 400 °C. Plasma of precursor vapors of (2,7,7-trimethyl-3,5-octanedionate) yttrium (known as Y(tod){sub 3}), (2,7,7-trimethyl-3,5-octanedionate) zirconium (known as Zr(tod){sub 4}), oxygen and argon gases is used for deposition. To the best of our knowledge, plasma assisted MOCVD of YSZ films using octanediaonate precursors have not been reported in the literature so far. The deposited films have been characterized by GIXRD, FTIR, XPS, FESEM, AFM, XANES, EXAFS, EDAX and spectroscopic ellipsometry. Thickness of the films has been measured by stylus profilometer while tribological property measurement has been done to study mechanical behavior of the coatings. Characterization by different techniques indicates that properties of the films are dependent on the yttria content as well as on the structure of the films.

  13. Enhanced corrosion resistance properties of radiofrequency cold plasma nitrided carbon steel: Gravimetric and electrochemical results

    Energy Technology Data Exchange (ETDEWEB)

    Bouanis, F.Z. [Laboratoire des Procedes d' Elaboration des Revetements Fonctionnels, PERF-LSPES UMR-CNRS 8008, ENSCL, BP 90108, F-59652 Villeneuve d' Ascq Cedex (France); Bentiss, F. [Laboratoire de Chimie de Coordination et d' Analytique, Faculte des Sciences, Universite Chouaib Doukkali, B.P. 20, M-24000 El Jadida (Morocco); Traisnel, M. [Laboratoire des Procedes d' Elaboration des Revetements Fonctionnels, PERF-LSPES UMR-CNRS 8008, ENSCL, BP 90108, F-59652 Villeneuve d' Ascq Cedex (France); Jama, C. [Laboratoire des Procedes d' Elaboration des Revetements Fonctionnels, PERF-LSPES UMR-CNRS 8008, ENSCL, BP 90108, F-59652 Villeneuve d' Ascq Cedex (France)], E-mail: charafeddine.jama@ensc-lille.fr

    2009-03-01

    Cold plasma nitriding treatment was performed to improve the corrosion resistance of C38 carbon steel. Nitriding process was conducted using a radiofrequency nitrogen plasma discharge for different times of treatment on non-heated substrates. The modification of the corrosion resistance characteristic of the C38 steel due to the treatment in acid medium (1 M HCl) were investigated by gravimetric and electrochemical tests such as potentiodynamic polarisation curves and electrochemical impedance spectroscopy (EIS). It was shown that the plasma nitriding treatment improves the corrosion resistance. Indeed, in the gravimetric tests, nitrided samples showed lower weight loss and lower corrosion rate in comparison to untreated one. In the Tafel polarisation tests, the nitrided samples showed greatly reduced corrosion current densities, anodic dissolution and also retarded the hydrogen evolution reaction. Using EIS method, an adequate structural model of the interface was used and the values of the corresponding parameters were calculated and discussed. The results obtained from weight loss and electrochemical studies were in reasonable agreement. X-ray photoelectron spectroscopy (XPS) was carried out to establish the mechanism of corrosion inhibition of nitrided C38 steel in 1 M HCl medium. The enhancement of the corrosion resistance is believed to be related to the iron nitride compound layer formed on the C38 steel surface during plasma nitriding, which protected the underlying metal from corrosive attack in the aggressive solutions.

  14. Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS

    Directory of Open Access Journals (Sweden)

    Stephan Ratzsch

    2015-11-01

    Full Text Available In this study, the influence of direct current (DC biasing on the growth of titanium dioxide (TiO2 layers and their nucleation behavior has been investigated. Titania films were prepared by plasma enhanced atomic layer deposition (PEALD using Ti(OiPr4 as metal organic precursor. Oxygen plasma, provided by remote inductively coupled plasma, was used as an oxygen source. The TiO2 films were deposited with and without DC biasing. A strong dependence of the applied voltage on the formation of crystallites in the TiO2 layer is shown. These crystallites form spherical hillocks on the surface which causes high surface roughness. By applying a higher voltage than the plasma potential no hillock appears on the surface. Based on these results, it seems likely, that ions are responsible for the nucleation and hillock growth. Hence, the hillock formation can be controlled by controlling the ion energy and ion flux. The growth per cycle remains unchanged, whereas the refractive index slightly decreases in the absence of energetic oxygen ions.

  15. Oxygen-plasma-modified biomimetic nanofibrous scaffolds for enhanced compatibility of cardiovascular implants

    Directory of Open Access Journals (Sweden)

    Anna Maria Pappa

    2015-01-01

    Full Text Available Electrospun nanofibrous scaffolds have been extensively used in several biomedical applications for tissue engineering due to their morphological resemblance to the extracellular matrix (ECM. Especially, there is a need for the cardiovascular implants to exhibit a nanostructured surface that mimics the native endothelium in order to promote endothelialization and to reduce the complications of thrombosis and implant failure. Thus, we herein fabricated poly-ε-caprolactone (PCL electrospun nanofibrous scaffolds, to serve as coatings for cardiovascular implants and guide tissue regeneration. Oxygen plasma treatment was applied in order to modify the surface chemistry of the scaffold and its effect on cell attachment and growth was evaluated. The conditions of the surface modification were properly adjusted in order to define those conditions of the treatment that result in surfaces favorable for cell growth, while maintaining morphological integrity and mechanical behavior. Goniometry (contact angle measurements, scanning electron microscopy (SEM, atomic force microscopy (AFM, and X-ray photoelectron spectroscopy (XPS measurements were used to evaluate the morphological and chemical changes induced by the plasma treatment. Moreover, depth-sensing nanoindentation was performed to study the resistance of the plasma-treated scaffolds to plastic deformation. Lastly, the cell studies indicated that all scaffolds were cytocompatible, with the plasma-treated ones expressing a more pronounced cell viability and adhesion. All the above findings demonstrate the great potential of these biomimetic tissue-engineering constructs as efficient coatings for enhanced compatibility of cardiovascular implants.

  16. The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2–N2 capacitive discharges

    Science.gov (United States)

    Napari, M.; Tarvainen, O.; Kinnunen, S.; Arstila, K.; Julin, J.; Fjellvåg, Ø. S.; Weibye, K.; Nilsen, O.; Sajavaara, T.

    2017-03-01

    Two distinguishable plasma modes in the O2–N2 radio frequency capacitively coupled plasma (CCP) used in remote plasma-enhanced atomic layer deposition (PEALD) were observed. Optical emission spectroscopy and spectra interpretation with rate coefficient analysis of the relevant processes were used to connect the detected modes to the α and γ modes of the CCP discharge. To investigate the effect of the plasma modes on the PEALD film growth, ZnO and TiO2 films were deposited using both modes and compared to the films deposited using direct plasma. The growth rate, thickness uniformity, elemental composition, and crystallinity of the films were found to correlate with the deposition mode. In remote CCP operations the transition to the γ mode can result in a parasitic discharge leading to uncontrollable film growth and thus limit the operation parameters of the capacitive discharge in the PEALD applications.

  17. CVD risk factors and ethnicity--a homogeneous relationship?

    Science.gov (United States)

    Forouhi, Nita G; Sattar, Naveed

    2006-04-01

    Current understanding of cardiovascular disease risk (CVD) is derived largely from studies of Caucasians of European origin. However, people of certain ethnic groups experience a disproportionately greater burden of CVD including coronary heart disease (CHD) and stroke. Adoption of a Westernised lifestyle has different effects on metabolic and vascular dysfunction across populations, e.g. South Asians have a higher prevalence of coronary heart disease (CHD) and cardiovascular mortality compared with Europeans. African-Americans demonstrate higher rates of CHD and stroke while African/Caribbeans in the UK have lower CHD rates and higher stroke rates than British Europeans. Other non-European groups such as the Chinese and Japanese exhibit consistently high rates of stroke but not CHD, while Mexican Americans have a higher prevalence of both stroke and CHD, and North American native Indians also have high rates of CHD. While conventional cardiovascular risk factors such as smoking, blood pressure and total cholesterol predict risk within these ethnic groups, they do not fully account for the differences in risk between ethnic groups, suggesting that alternative explanations might exist. Ethnic groups show differences in levels of visceral adiposity, insulin resistance, and novel risk markers such as C-reactive protein (CRP), adiponectin and plasma homocysteine. The marked differences across racial and ethnic groups in disease risk are likely due in part to each of genetic, host susceptibility and environmental factors, and can provide valuable aetiological clues to differences in patterns of disease presentation, therapeutic needs and response to treatment. Ongoing studies should increase understanding of ethnicity as a potential independent risk factor, thus enabling better identification of treatment targets and selection of therapy in specific populations.

  18. Preparation of Crystallized Carbon Nitride Based on Microwave Plasma CVD

    National Research Council Canada - National Science Library

    Masatoshi INOUE; Yukihiro SAKAMOTO; Matsufumi TAKAYA

    2010-01-01

    ... on. To obtain this material, generally CH4 is used as a carbon source. Therefore, to make clear the effects of the reaction gas on the preparation of carbon nitride, we tried to use C2H4 as a carbon source instead of CH4...

  19. Enhancement of wave growth for warm plasmas with a high-energy tail distribution

    Science.gov (United States)

    Thorne, Richard M.; Summers, Danny

    1991-01-01

    The classical linear theory of electromagnetic wave growth in a warm plasma is considered for waves propagating parallel to a uniform ambient magnetic field. Wave-growth rates are calculated for ion-driven right-hand mode waves for Kappa and Maxwellian particle distribution functions and for various values of the spectral index, the temperature anisotropy, and the ratio of plasma pressure to magnetic pressure appropriate to the solar wind. When the anisotropy is low the wave growth is limited to frequencies below the proton gyrofrequency and the growth rate increases dramatically as the spectral index is reduced. The growth rate for any Kappa distribution greatly exceeds that for a Maxwellian with the same bulk properties. For large thermal anisotropy the growth rate from either distribution is greatly enhanced. The growth rates from a Kappa distribution are generally larger than for a Maxwellian distribution, and significant wave growth occurs over a broader range of frequencies.

  20. Plasma-enhanced chemical vapor deposition of graphene on copper substrates

    Directory of Open Access Journals (Sweden)

    Nicolas Woehrl

    2014-04-01

    Full Text Available A plasma enhanced vapor deposition process is used to synthesize graphene from a hydrogen/methane gas mixture on copper samples. The graphene samples were transferred onto SiO2 substrates and characterized by Raman spectroscopic mapping and atomic force microscope topographical mapping. Analysis of the Raman bands shows that the deposited graphene is clearly SLG and that the sheets are deposited on large areas of several mm2. The defect density in the graphene sheets is calculated using Raman measurements and the influence of the process pressure on the defect density is measured. Furthermore the origin of these defects is discussed with respect to the process parameters and hence the plasma environment.

  1. Plasma etching to enhance the surface insulating stability of alumina for fusion applications

    Directory of Open Access Journals (Sweden)

    M. Malo

    2016-12-01

    Full Text Available A significant increase in the surface electrical conductivity of alumina, considered one of the most promising insulating materials for numerous applications in fusion devices, has been observed during ion bombardment in vacuum due to oxygen loss by preferential sputtering. Although this is expected to cause serious limitations to insulating components functionality, recent studies showed it is possible to restore the damaged lattice by oxygen reincorporation during thermal treatments in air. These studies also revealed a correlation between conductivity and ion beam induced luminescence, which is being used to monitor surface electrical conductivity degradation and help qualify the post irradiation recovery. Work now carried out for Wesgo alumina considers oxygen implantation and plasma etching as additional methods to improve recovered layer depth and quality. Both conductivity and luminescence results indicate the potential use of plasma etching not only for damage recovery, but also as a pre-treatment to enhance material stability during irradiation.

  2. Deposition of electrochromic tungsten oxide thin films by plasma-enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Henley, W.B.; Sacks, G.J. [Univ. of South Florida, Tampa, FL (United States). Center of Microelectronics

    1997-03-01

    Use of plasma-enhanced chemical vapor deposition (PECVD) for electrochromic WO{sub 3} film deposition is investigated. Oxygen, hydrogen, and tungsten hexafluoride were used as source gases. Reactant gas flow was investigated to determine the effect on film characteristics. High quality optical films were obtained at deposition rates on the order of 100 {angstrom}/s. Higher deposition rates were attainable but film quality and optical coherence degraded. Atomic emission spectroscopy (AES), was used to provide an in situ assessment of the plasma deposition chemistry. Through AES, it is shown that the hydrogen gas flow is essential to the deposition of the WO{sub 3} film. Oxygen gas flow and tungsten hexafluoride gas flow must be approximately equal for high quality films.

  3. Solar wind plasma profiles during interplanetary field enhancements (IFEs): Consistent with charged-dust pickup

    Science.gov (United States)

    Lai, H. R.; Wei, H. Y.; Russell, C. T.

    2013-06-01

    The solar wind contains many magnetic structures, and most of them have identifiable correlated changes in the flowing plasma. However, the very characteristic rise and fall of the magnetic field in an interplanetary field enhancement has no clear solar wind counterpart. It appears to be a pure magnetic ``barrier'' that transfers solar wind momentum to charged dust produced in collisions of interplanetary bodies in the size range of tens to hundreds of meters. This transfer lifts the fine scale dust out of the Sun's gravitational well. We demonstrate the lack of field-plasma correlation with several examples from spacecraft records as well as show an ensemble average velocity profile during IFEs which is consistent with our IFE formation hypothesis.

  4. Cold plasma welding of polyaniline nanofibers with enhanced electrical and mechanical properties

    Science.gov (United States)

    Ye, Dong; Yu, Yao; Liu, Lin; Lu, Xinpei; Wu, Yue

    2015-12-01

    Joining conducting polymer (CP) nanofibers into an interconnected porous network can result in good mechanical and electrical contacts between nanofibers that can be beneficial for the high performance of CP-based devices. Here, we demonstrate the cold welding of polyaniline (PAni) nanofiber loose ends with cold plasma. The room-temperature and atmospheric-pressure helium micro-plasma jet launches highly charged ion bullets at a PAni nanofiber target with high precision and the highly charged ion bullet selectively induces field emission at the sharp nanofiber loose ends. This technique joins nanofiber tips without altering the morphology of the film and protonation thus leading to significantly enhanced electrical and mechanical properties. In addition, this technique has high spatial resolution and is able to selectively weld and dope regions of nanofiber film with promising novel device applications.

  5. Radio-frequency oxygen-plasma-enhanced pulsed laser deposition of IGZO films

    Directory of Open Access Journals (Sweden)

    Chia-Man Chou

    2017-07-01

    Full Text Available We demonstrate the crystalline structures, optical transmittance, surface and cross-sectional morphologies, chemical compositions, and electrical properties of indium gallium zinc oxide (IGZO-based thin films deposited on glass and silicon substrates through pulsed laser deposition (PLD incorporated with radio-frequency (r.f.-generated oxygen plasma. The plasma-enhanced pulsed laser deposition (PEPLD-based IGZO thin films exhibited a c-axis-aligned crystalline (CAAC structure, which was attributed to the increase in Zn-O under high oxygen vapor pressure (150 mTorr. High oxygen vapor pressure (150 mTorr and low r.f. power (10 W are the optimal deposition conditions for fabricating IGZO thin films with improved electrical properties.

  6. Radio-frequency oxygen-plasma-enhanced pulsed laser deposition of IGZO films

    Science.gov (United States)

    Chou, Chia-Man; Lai, Chih-Chang; Chang, Chih-Wei; Wen, Kai-Shin; Hsiao, Vincent K. S.

    2017-07-01

    We demonstrate the crystalline structures, optical transmittance, surface and cross-sectional morphologies, chemical compositions, and electrical properties of indium gallium zinc oxide (IGZO)-based thin films deposited on glass and silicon substrates through pulsed laser deposition (PLD) incorporated with radio-frequency (r.f.)-generated oxygen plasma. The plasma-enhanced pulsed laser deposition (PEPLD)-based IGZO thin films exhibited a c-axis-aligned crystalline (CAAC) structure, which was attributed to the increase in Zn-O under high oxygen vapor pressure (150 mTorr). High oxygen vapor pressure (150 mTorr) and low r.f. power (10 W) are the optimal deposition conditions for fabricating IGZO thin films with improved electrical properties.

  7. Enhanced ion acceleration in the transition regime from opaque to transparent plasmas

    Science.gov (United States)

    Mishra, Rohini; Fiuza, Frederico; Glenzer, Siegfried

    2016-10-01

    Using Particle-in-Cell (PIC) simulations, we investigate ion acceleration in high-intensity laser-plasma interactions in for targets that become laser transparent to the laser during the interaction process. A theoretical model is developed to derive an optimal target electron areal density `n.L' as a function of laser normalized intensity and the pulse duration in the laser transparent regime. A large schematic parametric scan for a wide range of target electron density (n) and thickness (L) is performed and shown to be consistent with analytical prediction. Our simulations show that iIon acceleration in optimal conditions relies on the re-heating of the expanding sheath electrons by the laser and enhancing enhancement of the Target Normal Sheath Acceleration (TNSA) electric field after the plasma becomes transparent to the laser light. This enhanced TNSA field decays slower compared to conventional TNSA resulting in significantly higher proton energies. Our results open the way to the exploration of optimized ion acceleration in the transparency regime, not only with nm-scale foils but also with recently developed micron-scale hydrogen jets. This work was supported by the DOE Office of Science, Fusion Energy Science (FWP 100182).

  8. Fluorescence Enhancement of Fluorescein Isothiocyanate-Labeled Protein A Caused by Affinity Binding with Immunoglobulin G in Bovine Plasma

    Directory of Open Access Journals (Sweden)

    Kiyotaka Sakai

    2009-10-01

    Full Text Available Fluorescence enhancement of fluorescein isothiocyanate-labeled protein A (FITC-protein A caused by the binding with immunoglobulin G (IgG in bovine plasma was studied. FITC-protein A was immobilized onto a glass surface by covalent bonds. An increase in fluorescence intensity was dependent on IgG concentration ranging from 20 to 78 μg/mL in both phosphate buffer saline and bovine plasma. This method requires no separation procedure, and the reaction time is less than 15 min. A fluorescence enhancement assay by the affinity binding of fluorescence-labeled reagent is thus available for the rapid determination of biomolecules in plasma.

  9. Enhancement of the neutral-beam stopping cross section in fusion plasmas due to multistep collision processes

    Energy Technology Data Exchange (ETDEWEB)

    Boley, C.D.; Janev, R.K.; Post, D.E.

    1983-10-01

    Multistep processes involving excited atomic states are found to produce a substantial increase in the stopping cross section for a neutral hydrogen beam injected into a plasma, and thus to reduce the beam penetration. For typical plasma and beam parameters of current large tokamak experiments, the stopping cross-sectional enhancement is found to vary from 25% to 50% depending on the beam energy, plasma density, and impurity level. For neutral hydrogen beams with energies greater than or equal to 500 keV, envisioned in tokamak amd mirror reactor designs, the enhancement can be as large as 80 to 90%.

  10. Enhancement of H{sup -}/D{sup -} volume production in a double plasma type negative ion source

    Energy Technology Data Exchange (ETDEWEB)

    Fukumasa, Osamu; Nishimura, Hideki; Sakiyama, Satoshi [Yamaguchi Univ., Ube (Japan). Faculty of Engineering

    1997-02-01

    H{sup -}/D{sup -} production in a pure volume source has been studied. In our double plasma type negative ion source, both energy and density of fast electrons are well controlled. With the use of this source, the enhancement of H{sup -}/D{sup -} production has been observed. Namely, under the same discharge power, the extracted H{sup -}/D{sup -} current in the double plasma operation is higher than that in the single plasma operation. At the same time, measurements of plasma parameters have been made in the source and the extractor regions for these two cases. (author)

  11. Seminal plasma enhances cervical adenocarcinoma cell proliferation and tumour growth in vivo.

    Directory of Open Access Journals (Sweden)

    Jason R Sutherland

    Full Text Available Cervical cancer is one of the leading causes of cancer-related death in women in sub-Saharan Africa. Extensive evidence has shown that cervical cancer and its precursor lesions are caused by Human papillomavirus (HPV infection. Although the vast majority of HPV infections are naturally resolved, failure to eradicate infected cells has been shown to promote viral persistence and tumorigenesis. Furthermore, following neoplastic transformation, exposure of cervical epithelial cells to inflammatory mediators either directly or via the systemic circulation may enhance progression of the disease. It is well recognised that seminal plasma contains an abundance of inflammatory mediators, which are identified as regulators of tumour growth. Here we investigated the role of seminal plasma in regulating neoplastic cervical epithelial cell growth and tumorigenesis. Using HeLa cervical adenocarcinoma cells, we found that seminal plasma (SP induced the expression of the inflammatory enzymes, prostaglandin endoperoxide synthase (PTGS1 and PTGS2, cytokines interleukin (IL -6, and -11 and vascular endothelial growth factor-A (VEGF-A. To investigate the role of SP on tumour cell growth in vivo, we xenografted HeLa cells subcutaneously into the dorsal flank of nude mice. Intra-peritoneal administration of SP rapidly and significantly enhanced the tumour growth rate and size of HeLa cell xenografts in nude mice. As observed in vitro, we found that SP induced expression of inflammatory PTGS enzymes, cytokines and VEGF-A in vivo. Furthermore we found that SP enhances blood vessel size in HeLa cell xenografts. Finally we show that SP-induced cytokine production, VEGF-A expression and cell proliferation are mediated via the induction of the inflammatory PTGS pathway.

  12. Tritium Plasma Experiment Upgrade and Improvement of Surface Diagnostic Capabilities at STAR Facility for Enhancing Tritium and Nuclear PMI Sciences

    Energy Technology Data Exchange (ETDEWEB)

    Shimada, M.; Taylor, C. N.; Pawelko, R. J.; Cadwallader, L. C.; Merrill, B. J.

    2016-04-01

    The Tritium Plasma Experiment (TPE) is a unique high-flux linear plasma device that can handle beryllium, tritium, and neutron-irradiated plasma facing materials, and is the only existing device dedicated to directly study tritium retention and permeation in neutron-irradiated materials with tritium [M. Shimada et.al., Rev. Sci. Instru. 82 (2011) 083503 and and M. Shimada, et.al., Nucl. Fusion 55 (2015) 013008]. The plasma-material-interaction (PMI) determines a boundary condition for diffusing tritium into bulk PFCs, and the tritium PMI is crucial for enhancing fundamental sciences that dictate tritium fuel cycles and safety and are high importance to an FNSF and DEMO. Recently the TPE has undergone major upgrades in its electrical and control systems. New DC power supplies and a new control center enable remote plasma operations from outside of the contamination area for tritium, minimizing the possible exposure risk with tritium and beryllium. We discuss the electrical upgrade, enhanced operational safety, improved plasma performance, and development of optical spectrometer system. This upgrade not only improves operational safety of the worker, but also enhances plasma performance to better simulate extreme plasma-material conditions expected in ITER, Fusion Nuclear Science Facility (FNSF), and Demonstration reactor (DEMO). This work was prepared for the U.S. Department of Energy, Office of Fusion Energy Sciences, under the DOE Idaho Field Office contract number DE-AC07-05ID14517.

  13. Mo-C Multilayered CVD Coatings

    Directory of Open Access Journals (Sweden)

    A. Sagalovych

    2013-12-01

    Full Text Available Production processes of multi-layered Mo-C coatings by the method of chemical vapor deposition (CVD with the use of organometallic compounds were developed. Coatings are applied on technical purpose steel DIN 1.2379 (H12F1 and DIN 1.7709 (25H2MF (ÉI10 heat-treated ball with the high class of surface roughness (> 10. The average deposition rate was 50 μm / h. The optimal conditions of deposition coatings for different technological schemas were defined. Metallographic investigations of the obtained coatings were carried out. Tribological studies of the friction and wear characteristics of sliding friction in conditions of boundary lubrication of Ï-S multilayered CVD coatings shows, that coatings have low friction coefficients (0075-0095 at loads up to 2.0 kN, showed high resistance to wear and are effective in increasing the stability of the pair for precision friction pairs of hydraulical units.

  14. High collection efficiency CVD diamond alpha detectors

    Energy Technology Data Exchange (ETDEWEB)

    Bergonzo, P.; Foulon, F.; Marshall, R.D.; Jany, C.; Brambilla, A. [CEA/Saclay, Gif-sur-Yvette (France); McKeag, R.D.; Jackman, R.B. [University College London (United Kingdom). Electronic and Electrical Engineering Dept.

    1998-06-01

    Advances in Chemical Vapor Deposited (CVD) diamond have enabled the routine use of this material for sensor device fabrication, allowing exploitation of its unique combination of physical properties (low temperature susceptibility (> 500 C), high resistance to radiation damage (> 100 Mrad) and to corrosive media). A consequence of CVD diamond growth on silicon is the formation of polycrystalline films which has a profound influence on the physical and electronic properties with respect to those measured on monocrystalline diamond. The authors report the optimization of physical and geometrical device parameters for radiation detection in the counting mode. Sandwich and co-planar electrode geometries are tested and their performances evaluated with regard to the nature of the field profile and drift distances inherent in such devices. The carrier drift length before trapping was measured under alpha particles and values as high as 40% of the overall film thickness are reported. Further, by optimizing the device geometry, they show that a gain in collection efficiency, defined as the induced charge divided by the deposited charge within the material, can be achieved even though lower bias values are used.

  15. TSC response of irradiated CVD diamond films

    CERN Document Server

    Borchi, E; Bucciolini, M; Guasti, A; Mazzocchi, S; Pirollo, S; Sciortino, S

    1999-01-01

    CVD diamond films have been irradiated with electrons, sup 6 sup 0 Co photons and protons in order to study the dose response to exposure to different particles and energies and to investigate linearity with dose. The Thermally Stimulated Current (TSC) has been studied as a function of the dose delivered to polymethilmetacrilate (PMMA) in the range from 1 to 12 Gy with 20 MeV electrons from a linear accelerator. The TSC spectrum has revealed the presence of two components with peak temperatures of about 470 and 520 K, corresponding to levels lying in the diamond band gap with activation energies of the order of 0.7 - 1 eV. After the subtraction of the exponential background the charge emitted during the heating scan has been evaluated and has been found to depend linearly on the dose. The thermally emitted charge of the CVD diamond films has also been studied using different particles. The samples have been irradiated with the same PMMA dose of about 2 Gy with 6 and 20 MeV electrons from a Linac, sup 6 sup 0 ...

  16. Studies on non-oxide coating on carbon fibers using plasma enhanced chemical vapor deposition technique

    Science.gov (United States)

    Patel, R. H.; Sharma, S.; Prajapati, K. K.; Vyas, M. M.; Batra, N. M.

    2016-05-01

    A new way of improving the oxidative behavior of carbon fibers coated with SiC through Plasma Enhanced Chemical Vapor Deposition technique. The complete study includes coating of SiC on glass slab and Stainless steel specimen as a starting test subjects but the major focus was to increase the oxidation temperature of carbon fibers by PECVD technique. This method uses relatively lower substrate temperature and guarantees better stoichiometry than other coating methods and hence the substrate shows higher resistance towards mechanical and thermal stresses along with increase in oxidation temperature.

  17. Ionization enhanced ion collection by a small floating grain in plasmas

    CERN Document Server

    Khrapak, Sergey A

    2011-01-01

    It is demonstrated that the ionization events in the vicinity of a small floating grain can increase the ion flux to its surface. In this respect the effect of electron impact ionization is fully analogous to that of the ion-neutral resonant charge exchange collisions. Both processes create slow ion which cannot overcome grain' electrical attraction and eventually fall onto its surface. The relative importance of ionization and ion-neutral collisions is roughly given by the ratio of the corresponding frequencies. We have evaluated this ratio for neon and argon plasmas to demonstrate that ionization enhanced ion collection can indeed be an important factor affecting grain charging in realistic experimental conditions.

  18. Enhanced Proton Acceleration by an Ultrashort Laser Interaction with Structured Dynamic Plasma Targets

    CERN Document Server

    Zigler, A; Botton, M; Nahum, E; Schleifer, E; Baspaly, A; Pomerantz, Y; Abicht, F; Branzel, J; Priebe, G; Steinke, S; Andreev, A; Schnuerer, M; Sandner, W; Gordon, D; Sprangle, P; Ledingham, K W D

    2013-01-01

    We experimentally demonstrate a notably enhanced acceleration of protons to high energy by relatively modest ultrashort laser pulses and structured dynamical plasma targets. Realized by special deposition of snow targets on sapphire substrates and using carefully planned pre-pulses, high proton yield emitted in a narrow solid angle with energy above 21MeV were detected from a 5TW laser. Our simulations predict that using the proposed scheme protons can be accelerated to energies above 150MeV by 100TW laser systems.

  19. Synthesis of carbon nanotube array using corona discharge plasma-enhanced chemical vapor deposition

    Institute of Scientific and Technical Information of China (English)

    2003-01-01

    A corona discharge plasma-enhanced chemical vapor deposition with the features of atmospheric pressure and low temperature has been developed to synthesize the carbon nanotube array. The array was synthesized from methane and hydrogen mixture in anodic aluminum oxide template channels in that cobalt was electrodeposited at the bottom. The characterization results by the scanning electron microscopy, transmission electron microscopy, energy dispersive X-ray spectroscopy and Raman spectroscopy indicate that the array consists of carbon nanotubes with the diameter of about 40 nm and the length of more than 4 -m, and the carbon nanotubes are mainly restrained within the channels of templates.

  20. Enhanced Fullerene Yield in Plasma-Aerosol Reactor at Cryogenic Boundary Temperature

    CERN Document Server

    Jouravlev, Mikhail

    2011-01-01

    We demonstrate remarkably enhanced yield of C60 fullerenes in an aerosol discharge chamber due to the additional presence of a strong spatial temperature gradient. The role of the temperature gradients in the increased yield of C60 and fullerene-like structures is discussed. The reaction is not fully reversible and carbon soot matter is formed as a secondary product in the form of carbon aerosol particles. The increasing concentration of C60 was easily recognized from the characteristic UV-spectra. The result of this paper will be useful for improvement of fullerene synthesis technology and for application to constructing new types of aerosol-plasma reactors.

  1. Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition

    KAUST Repository

    Zhao, Chao

    2013-09-01

    The growth of TiO2 films by plasma enhanced atomic layer deposition using Star-Ti as a precursor has been systematically studied. The conversion from amorphous to crystalline TiO2 was observed either during high temperature growth or annealing process of the films. The refractive index and bandgap of TiO2 films changed with the growth and annealing temperatures. The optimization of the annealing conditions for TiO2 films was also done by morphology and density studies. © 2013 Elsevier B.V. All rights reserved.

  2. Cluster spacecraft observations of a ULF wave enhanced by Space Plasma Exploration by Active Radar (SPEAR

    Directory of Open Access Journals (Sweden)

    S. V. Badman

    2009-09-01

    Full Text Available Space Plasma Exploration by Active Radar (SPEAR is a high-latitude ionospheric heating facility capable of exciting ULF waves on local magnetic field lines. We examine an interval from 1 February 2006 when SPEAR was transmitting a 1 Hz modulation signal with a 10 min on-off cycle. Ground magnetometer data indicated that SPEAR modulated currents in the local ionosphere at 1 Hz, and enhanced a natural field line resonance with a 10 min period. During this interval the Cluster spacecraft passed over the heater site. Signatures of the SPEAR-enhanced field line resonance were present in the magnetic field data measured by the magnetometer on-board Cluster-2. These are the first joint ground- and space-based detections of field line tagging by SPEAR.

  3. Enhancement of wave and acceleration of electron in plasma in the external field

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    This paper investigates the enhancement of Langmuir and ion-acoustic wave and the acceleration of the electron in collisionless plasma.in the presence of an external transverse field.Based on hydrodynamic equations,an equation formulizing the parametric instability was derived.Furthermore,the formula for ponderomotive force and the expression that describes the electron acceleration were obtained.The results show that Langmuir and ion-acoustic wave are enhanced and the charged particles can be accelerated by the coupling of wave-wave.In addition,it can be concluded that ponderomotive force,due to the coupling of the external field(pump)to the Langmuir wave(ion-acoustic wave),is the driving force to excite the parametric instability and comprises the high- and low-frequency components.

  4. Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study

    Energy Technology Data Exchange (ETDEWEB)

    Sowińska, Małgorzata, E-mail: malgorzata.sowinska@b-tu.de; Henkel, Karsten; Schmeißer, Dieter [Brandenburg University of Technology Cottbus-Senftenberg, Applied Physics and Sensors, K.-Wachsmann-Allee 17, 03046 Cottbus (Germany); Kärkkänen, Irina; Schneidewind, Jessica; Naumann, Franziska; Gruska, Bernd; Gargouri, Hassan [SENTECH Instruments GmbH, Schwarzschildstraße 2, 12489 Berlin (Germany)

    2016-01-15

    The process parameters' impact of the plasma-enhanced atomic layer deposition (PE-ALD) method on the oxygen to nitrogen (O/N) ratio in titanium oxynitride (TiO{sub x}N{sub y}) films was studied. Titanium(IV)isopropoxide in combination with NH{sub 3} plasma and tetrakis(dimethylamino)titanium by applying N{sub 2} plasma processes were investigated. Samples were characterized by the in situ spectroscopic ellipsometry, x-ray photoelectron spectroscopy, and electrical characterization (current–voltage: I-V and capacitance–voltage: C-V) methods. The O/N ratio in the TiO{sub x}N{sub y} films is found to be very sensitive for their electric properties such as conductivity, dielectric breakdown, and permittivity. Our results indicate that these PE-ALD film properties can be tuned, via the O/N ratio, by the selection of the process parameters and precursor/coreactant combination.

  5. Hole injection enhancement in organic light emitting devices using plasma treated graphene oxide

    Science.gov (United States)

    Jesuraj, P. Justin; Parameshwari, R.; Kanthasamy, K.; Koch, J.; Pfnür, H.; Jeganathan, K.

    2017-03-01

    The hole injection layer (HIL) with high work function (WF) is desirable to reduce the injection barrier between anode and hole transport layer in organic light emitting devices (OLED). Here, we report a novel approach to tune the WF of graphene oxide (GO) using oxygen and hydrogen plasma treatment and its hole injection properties in OLEDs. The mild exposure of oxygen plasma on GO (O2-GO) significantly reduces the injection barrier by increasing the WF of anode (4.98 eV) through expansion of Csbnd O bonds. In contrast, the hole injection barrier was drastically increased for hydrogen plasma treated GO (H2-GO) layers as the WF is lowered by the contraction of Csbnd O bond. By employing active O2-GO as HIL in OLEDs found to exhibit superior current efficiency of 4.2 cd/A as compared to 3.3 cd/A for pristine GO. Further, the high injection efficiency of O2-GO infused hole only device can be attributed to the improved energy level matching. Ultraviolet and X-ray photoelectron spectroscopy were used to correlate the WF of HIL infused anode towards the enhanced performance of OLEDs with their capricious content of Csbnd O in GO matrix.

  6. Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition

    CERN Document Server

    Kim, H

    2002-01-01

    We have investigated the growth kinetics of plasma-enhanced Ti atomic layer deposition (ALD) using a quartz crystal microbalance. Ti ALD films were grown at temperatures from 20 to 200 deg. C using TiCl sub 4 as a source gas and rf plasma-produced atomic H as the reducing agent. Postdeposition ex situ chemical analyses of thin films showed that the main impurity is oxygen, mostly incorporated during the air exposure prior to analysis. The thickness per cycle, corresponding to the growth rate, was measured by quartz crystal microbalance as a function of various key growth parameters, including TiCl sub 4 and H exposure time, rf plasma power, and sample temperature. The growth rates were independent of TiCl sub 4 exposure above 1x10 sup 3 L, indicating typical ALD mode growth. The key kinetic parameters for Cl extraction reaction and TiCl sub 4 adsorption kinetics were obtained and the growth kinetics were modeled to predict the growth rates based upon these results. Also, the dependency of growth kinetics on d...

  7. Enhancement of photovoltaic response in multilayer MoS2 induced by plasma doping.

    Science.gov (United States)

    Wi, Sungjin; Kim, Hyunsoo; Chen, Mikai; Nam, Hongsuk; Guo, L Jay; Meyhofer, Edgar; Liang, Xiaogan

    2014-05-27

    Layered transition-metal dichalcogenides hold promise for making ultrathin-film photovoltaic devices with a combination of excellent photovoltaic performance, superior flexibility, long lifetime, and low manufacturing cost. Engineering the proper band structures of such layered materials is essential to realize such potential. Here, we present a plasma-assisted doping approach for significantly improving the photovoltaic response in multilayer MoS2. In this work, we fabricated and characterized photovoltaic devices with a vertically stacked indium tin oxide electrode/multilayer MoS2/metal electrode structure. Utilizing a plasma-induced p-doping approach, we are able to form p-n junctions in MoS2 layers that facilitate the collection of photogenerated carriers, enhance the photovoltages, and decrease reverse dark currents. Using plasma-assisted doping processes, we have demonstrated MoS2-based photovoltaic devices exhibiting very high short-circuit photocurrent density values up to 20.9 mA/cm(2) and reasonably good power-conversion efficiencies up to 2.8% under AM1.5G illumination, as well as high external quantum efficiencies. We believe that this work provides important scientific insights for leveraging the optoelectronic properties of emerging atomically layered two-dimensional materials for photovoltaic and other optoelectronic applications.

  8. In-situ hydrogen and oxygen plasma purification of carbon nanotubes

    Energy Technology Data Exchange (ETDEWEB)

    Kang, Mi Hyun; Kim, Yang Do; Jeon, Hyeong Tag [Hanyang Univ., Seoul (Korea, Republic of)

    2001-12-01

    Bulk bundles, which are obtained after purification of carbon soot containing nanotubes (CNTs), are commonly used as electron emitters. However, CNTs grown by chemical vapor deposition (CVD) at low temperature using a nickel (Ni) catalyst still contain impurities, such as amorphous carbon and catalytic metal particles, and need to be purified. We grew CNTs on silicon substrates with native oxides by using a Ni catalyst and plasma-enhanced CVD at 600 .deg. C with a mixture of CH{sub 4}, NH{sub 3}, and H{sub 2} gases. CNTs were observed to have multi-wall structures with large inside hollow cores containing Ni. CNTs with a typical dimension of a few tens of nm in diameter and several m in length were observed. In-situ hydrogen plasma treatment successfully removed the residual carbonaceous particles and metallic impurities without significant structural damage to the individual CNTs. This study demonstrated a simple and efficient in-situ plasma purification process for CNTs grown by using plasma-enhanced CVD.

  9. Superhydrophobic Copper Surfaces with Anticorrosion Properties Fabricated by Solventless CVD Methods.

    Science.gov (United States)

    Vilaró, Ignasi; Yagüe, Jose L; Borrós, Salvador

    2017-01-11

    Due to continuous miniaturization and increasing number of electrical components in electronics, copper interconnections have become critical for the design of 3D integrated circuits. However, corrosion attack on the copper metal can affect the electronic performance of the material. Superhydrophobic coatings are a commonly used strategy to prevent this undesired effect. In this work, a solventless two-steps process was developed to fabricate superhydrophobic copper surfaces using chemical vapor deposition (CVD) methods. The superhydrophobic state was achieved through the design of a hierarchical structure, combining micro-/nanoscale domains. In the first step, O2- and Ar-plasma etchings were performed on the copper substrate to generate microroughness. Afterward, a conformal copolymer, 1H,1H,2H,2H-perfluorodecyl acrylate-ethylene glycol diacrylate [p(PFDA-co-EGDA)], was deposited on top of the metal via initiated CVD (iCVD) to lower the surface energy of the surface. The copolymer topography exhibited a very characteristic and unique nanoworm-like structure. The combination of the nanofeatures of the polymer with the microroughness of the copper led to achievement of the superhydrophobic state. AFM, SEM, and XPS were used to characterize the evolution in topography and chemical composition during the CVD processes. The modified copper showed water contact angles as high as 163° and hysteresis as low as 1°. The coating withstood exposure to aggressive media for extended periods of time. Tafel analysis was used to compare the corrosion rates between bare and modified copper. Results indicated that iCVD-coated copper corrodes 3 orders of magnitude slower than untreated copper. The surface modification process yielded repeatable and robust superhydrophobic coatings with remarkable anticorrosion properties.

  10. Gamma-hydroxybutyrate enhances mood and prosocial behavior without affecting plasma oxytocin and testosterone.

    Science.gov (United States)

    Bosch, Oliver G; Eisenegger, Christoph; Gertsch, Jürg; von Rotz, Robin; Dornbierer, Dario; Gachet, M Salomé; Heinrichs, Markus; Wetter, Thomas C; Seifritz, Erich; Quednow, Boris B

    2015-12-01

    Gamma-hydroxybutyrate (GHB) is a GHB-/GABAB-receptor agonist. Reports from GHB abusers indicate euphoric, prosocial, and empathogenic effects of the drug. We measured the effects of GHB on mood, prosocial behavior, social and non-social cognition and assessed potential underlying neuroendocrine mechanisms. GHB (20mg/kg) was tested in 16 healthy males, using a randomized, placebo-controlled, cross-over design. Subjective effects on mood were assessed by visual-analogue-scales and the GHB-Specific-Questionnaire. Prosocial behavior was examined by the Charity Donation Task, the Social Value Orientation test, and the Reciprocity Task. Reaction time, memory, empathy, and theory-of-mind were also tested. Blood plasma levels of GHB, oxytocin, testosterone, progesterone, dehydroepiandrosterone (DHEA), cortisol, aldosterone, and adrenocorticotropic-hormone (ACTH) were determined. GHB showed stimulating and sedating effects, and elicited euphoria, disinhibition, and enhanced vitality. In participants with low prosociality, the drug increased donations and prosocial money distributions. In contrast, social cognitive abilities such as emotion recognition, empathy, and theory-of-mind, and basal cognitive functions were not affected. GHB increased plasma progesterone, while oxytocin and testosterone, cortisol, aldosterone, DHEA, and ACTH levels remained unaffected. GHB has mood-enhancing and prosocial effects without affecting social hormones such as oxytocin and testosterone. These data suggest a potential involvement of GHB-/GABAB-receptors and progesterone in mood and prosocial behavior. Copyright © 2015 Elsevier Ltd. All rights reserved.

  11. Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films

    Energy Technology Data Exchange (ETDEWEB)

    Broas, Mikael, E-mail: mikael.broas@aalto.fi; Vuorinen, Vesa [Department of Electrical Engineering and Automation, Aalto University, P.O. Box 13500, FIN-00076 Aalto, Espoo (Finland); Sippola, Perttu; Pyymaki Perros, Alexander; Lipsanen, Harri [Department of Micro- and Nanosciences, Aalto University, P.O. Box 13500, FIN-00076 Aalto, Espoo (Finland); Sajavaara, Timo [Department of Physics, University of Jyväskylä, P.O. Box 35, FIN-40014 Jyväskylä (Finland); Paulasto-Kröckel, Mervi [Department of Electrical Engineering and Automation, Aalto University. P.O. Box 13500, FIN-00076 Aalto, Espoo (Finland)

    2016-07-15

    Plasma-enhanced atomic layer deposition was utilized to grow aluminum nitride (AlN) films on Si from trimethylaluminum and N{sub 2}:H{sub 2} plasma at 200 °C. Thermal treatments were then applied on the films which caused changes in their chemical composition and nanostructure. These changes were observed to manifest in the refractive indices and densities of the films. The AlN films were identified to contain light element impurities, namely, H, C, and excess N due to nonideal precursor reactions. Oxygen contamination was also identified in the films. Many of the embedded impurities became volatile in the elevated annealing temperatures. Most notably, high amounts of H were observed to desorb from the AlN films. Furthermore, dinitrogen triple bonds were identified with infrared spectroscopy in the films. The triple bonds broke after annealing at 1000 °C for 1 h which likely caused enhanced hydrolysis of the films. The nanostructure of the films was identified to be amorphous in the as-deposited state and to become nanocrystalline after 1 h of annealing at 1000 °C.

  12. Instability-Enhanced Collisional Friction Determines the Bohm Criterion in Multiple-Ion-Species Plasmas

    Science.gov (United States)

    Baalrud, S. D.; Hegna, C. C.; Callen, J. D.

    2009-11-01

    Ion-ion streaming instabilities are excited in the presheath region of plasmas with multiple ion species if the ions are much colder than the electrons. Streaming instabilities onset when the relative fluid flow between ion species exceeds a critical speed, δVc, of order the ion thermal speeds. Using a generalized Lenard-Balescu theory that accounts for instability-enhanced collective responses [1], one is able to show the instabilities rapidly enhance the collisional friction between ion species far beyond the contribution from Coulomb collisions alone. This strong frictional force determines the relative fluid speed between species. When this condition is combined with the Bohm criterion generalized for multiple ion species, the fluid speed of each ion species is determined at the sheath edge. For each species, this speed differs from the common ``system'' sound speed by a factor that depends on the species concentrations, masses and δVc.[4pt] [1] S.D. Baalrud, J.D. Callen, and C.C. Hegna, Phys. Plasmas 15, 092111 (2008).

  13. Q-factors of CVD monolayer graphene and graphite inductors

    Science.gov (United States)

    Wang, Zidong; Zhang, Qingping; Peng, Pei; Tian, Zhongzheng; Ren, Liming; Zhang, Xing; Huang, Ru; Wen, Jincai; Fu, Yunyi

    2017-08-01

    A carbon-based inductor may serve as an important passive component in a carbon-based radio-frequency (RF) integrated circuit (IC). In this work, chemical vapor deposition (CVD) synthesized monolayer graphene and graphite inductors are fabricated and their Q-factors are investigated. We find that the large series resistance of signal path (including coil resistance and contact resistance) in monolayer graphene inductors causes negative Q-factors at the whole frequency range in measurement. Comparatively, some of the graphite inductors have all of their Q-factors above zero, due to their small signal path resistance. We also note that some other graphite inductors have negative Q-factor values at low frequency regions, but positive Q-factor values at high frequency regions. With an equivalent circuit model, we confirm that the negative Q-factors of some graphite inductors at low frequency regions are related to their relatively large contact resistances, and we are able to eliminate these negative Q-factors by improving the graphite-metal contact. Furthermore, the peak Q-factor (Q p) can be enhanced by lowering down the resistance of graphite coil. For an optimized 3/4-turn graphite inductor, the measured maximum Q-factor (Q m) can reach 2.36 and the peak Q-factor is theoretically predicted by the equivalent circuit to be as high as 6.46 at a high resonant frequency, which is beyond the testing frequency range. This research indicates that CVD synthesized graphite thin film is more suitable than graphene for fabricating inductors in carbon-based RF IC in the future.

  14. Constitutive Expression of the Vi Polysaccharide Capsular Antigen in Attenuated Salmonella enterica Serovar Typhi Oral Vaccine Strain CVD 909

    Science.gov (United States)

    Wang, Jin Yuan; Noriega, Fernando R.; Galen, James E.; Barry, Eileen; Levine, Myron M.

    2000-01-01

    Live oral Ty21a and parenteral Vi polysaccharide vaccines provide significant protection against typhoid fever, albeit by distinct immune mechanisms. Vi stimulates serum immunoglobulin G Vi antibodies, whereas Ty21a, which does not express Vi, elicits humoral and cell-mediated immune responses other than Vi antibodies. Protection may be enhanced if serum Vi antibody as well as cell-mediated and humoral responses can be stimulated. Disappointingly, several new attenuated Salmonella enterica serovar Typhi oral vaccines (e.g., CVD 908-htrA and Ty800) that elicit serum O and H antibody and cell-mediated responses following a single dose do not stimulate serum Vi antibody. Vi expression is regulated in response to environmental signals such as osmolarity by controlling the transcription of tviA in the viaB locus. To investigate if Vi antibodies can be stimulated if Vi expression is rendered constitutive, we replaced PtviA in serovar Typhi vaccine CVD 908-htrA with the constitutive promoter Ptac, resulting in CVD 909. CVD 909 expresses Vi even under high-osmolarity conditions and is less invasive for Henle 407 cells. In mice immunized with a single intranasal dose, CVD 909 was more immunogenic than CVD 908-htrA in eliciting serum Vi antibodies (geometric mean titer of 160 versus 49, P = 0.0007), whereas O antibody responses were virtually identical (geometric mean titer of 87 versus 80). In mice challenged intraperitoneally with wild-type serovar Typhi 4 weeks after a single intranasal immunization, the mortality of those immunized with CVD 909 (3 of 8) was significantly lower than that of control mice (10 of 10, P = 0.043) or mice given CVD 908-htrA (9 of 10, P = 0.0065). PMID:10899868

  15. Nanotexturing of Conjugated Polymers via One-Step Maskless Oxygen Plasma Etching for Enhanced Tunable Wettability.

    Science.gov (United States)

    Jiang, Youhua; Xu, Jian; Lee, Junghoon; Du, Ke; Yang, Eui-Hyeok; Moon, Myoung-Woon; Choi, Chang-Hwan

    2017-07-11

    A one-step maskless oxygen plasma etching process is investigated to nanopattern conjugated polymer dodecylbenzenesulfonate doped polypyrrole (PPy(DBS)) and to examine the effects of nanostructures on the inherent tunable wettability of the surface and the droplet mobility. Etching characteristics such as the geometry and dimensions of the nanostructures are systematically examined for the etching power and duration. The mechanism of self-formation of vertically aligned dense-array pillared nanostructures in the one-step maskless oxygen plasma etching process is also investigated. Results show that lateral dimensions such as the periodicity and diameter of the pillared nanostructures are insensitive to the etching power and duration, whereas the length and aspect ratio of the nanostructures increase with them. X-ray photoelectron spectroscopy analysis and thermal treatment of the polymer reveal that the codeposition of impurities on the surface resulting from the holding substrate is the primary reason for the self-formation of nanostructures during the oxygen plasma etching, whereas the local crystallinity subject to thermal treatment has a minor effect on the lateral dimensions. Retaining the tunable wettability (oleophobicity) for organic droplets during the electrochemical redox (i.e., reduction and oxidization) process, the nanotextured PPy(DBS) surface shows significant enhancement of droplet mobility compared to that of the flat PPy(DBS) surface with no nanotexture by making the surface superoleophobic (i.e., in a Cassie-Baxter wetting state). Such enhancement of the tunable oleophobicity and droplet mobility of the conjugated polymer will be of great significance in many applications such as microfluidics, lab-on-a-chip devices, and water/oil treatment.

  16. Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition

    Science.gov (United States)

    Jhang, Pei-Ci; Lu, Chi-Pin; Shieh, Jung-Yu; Yang, Ling-Wu; Yang, Tahone; Chen, Kuang-Chao; Lu, Chih-Yuan

    2017-07-01

    An N-rich silicon nitride film, with a lower refractive index (RI) than the stoichiometric silicon nitride (RI = 2.01), was deposited by alternating the exposure of dichlorosilane (DCS, SiH2Cl2) and that of ammonia (NH3) in a plasma-enhanced atomic layer deposition (PEALD) process. In this process, the plasma ammonia was easily decomposed to reactive radicals by RF power activating so that the N-rich silicon nitride was easily formed by excited ammonia radicals. The growth kinetics of N-rich silicon nitride were examined at various deposition temperatures ranging from 400 °C to 630 °C; the activation energy (Ea) decreased as the deposition temperature decreased below 550 °C. N-rich silicon nitride film with a wide range of values of refractive index (RI) (RI = 1.86-2.00) was obtained by regulating the deposition temperature. At the optimal deposition temperature, the effects of RF power, NH3 flow rate and NH3 flow time were on the characteristics of the N-rich silicon nitride film were evaluated. The results thus reveal that the properties of the N-rich silicon nitride film that was formed by under plasma-enhanced atomic layer deposition (PEALD) are dominated by deposition temperature. In charge trap flash (CTF) study, an N-rich silicon nitride film was applied to MAONOS device as a charge-trapping layer. The films exhibit excellent electron trapping ability and favor a fresh cell data retention performance as the deposition temperature decreased.

  17. Solution plasma synthesis of Au nanoparticles for coating titanium dioxide to enhance its photocatalytic activity

    Energy Technology Data Exchange (ETDEWEB)

    Nakasugi, Yuki; Saito, Genki [Center for Advanced Research of Energy and Materials, Hokkaido University, Sapporo 060-8628 (Japan); Yamashita, Toru [Faculty of Engineering, Hokkaido University, Sapporo 060-8628 (Japan); Sakaguchi, Norihito [Center for Advanced Research of Energy and Materials, Hokkaido University, Sapporo 060-8628 (Japan); Akiyama, Tomohiro, E-mail: takiyama@eng.hokudai.ac.jp [Center for Advanced Research of Energy and Materials, Hokkaido University, Sapporo 060-8628 (Japan)

    2015-05-29

    A convenient method for coating titanium dioxide (TiO{sub 2}) by Au nanoparticles (AuNPs) is demonstrated in solution plasma to improve the photocatalytic activity of TiO{sub 2}. AuNPs from a metallic Au electrode were bonded to the surface of a commercial TiO{sub 2} powder, which acted as a catalyst support, with the reaction taking place in an electrolyte solution. The effect of diverse plasma conditions on the size and productivity of the AuNPs was investigated initially to provide a reference in the absence of TiO{sub 2}. At 290 V, “partial plasma” was attained, with only a weak light emission surrounding the Au electrode. Conditions then evolved to “full plasma”, with a strong orange emission at 330 V. Partial or full status was maintained for 1 h at 300 and 400 V, respectively. At the transition to full, the AuNP particle size increased from 3.72 to 6.09 nm and the productivity increased dramatically from 0.025 to 0.87 mg h{sup −1} mm{sup −2}. Stronger plasma very efficiently synthesized AuNPs, and therefore, it was adopted for further study. AuNP-TiO{sub 2} combinations were formed by applying 400 V to a TiO{sub 2}-dispersed solution. In these experiments, TiO{sub 2} coated with AuNPs was synthesized; these combinations of AuNP-TiO{sub 2} had 0.44 mol% of Au. The photocatalytic activity of AuNP-TiO{sub 2} was investigated by measuring the degradation of Rhodamine B (RhB). Under UV irradiation, the AuNP-TiO{sub 2} particles removed up to 95% of the dye in 70 min. Commercial TiO{sub 2} achieves values closer to 85%. The results thus raise the possibility that solution plasma methods can be generalized as a means for achieving catalysis-enhancing coatings. - Highlights: • Au nanoparticles with a diameter of several nm were synthesized by solution plasma. • The effect of plasma conditions on the Au nanoparticles formation was investigated. • High resolution TEM was conducted to investigate the crystal structure. • Au nanoparticles were coated

  18. Enhancing The Mode Conversion Efficiency In JET Plasmas With Multiple Mode Conversion Layers

    Science.gov (United States)

    Van Eester, D.; Lerche, E.; Johnson, T.; Hellsten, T.; Ongena, J.; Mayoral, M.-L.; Frigione, D.; Sozzi, C.; Calabro, G.; Lennholm, M.; Beaumont, P.; Blackman, T.; Brennan, D.; Brett, A.; Cecconello, M.; Coffey, I.; Coyne, A.; Crombe, K.; Czarnecka, A.; Felton, R.; Johnson, M. Gatu; Giroud, C.; Gorini, G.; Hellesen, C.; Jacquet, P.; Kazakov, Y.; Kiptily, V.; Knipe, S.; Krasilnikov, A.; Lin, Y.; Maslov, M.; Monakhov, I.; Noble, C.; Nocente, M.; Pangioni, L.; Proverbio, I.; Stamp, M.; Studholme, W.; Tardocchi, M.; Versloot, T. W.; Vdovin, V.; Whitehurst, A.; Wooldridge, E.; Zoita, V.

    2011-12-01

    The constructive interference effect described by Fuchs et al. [1] shows that the mode conversion and thereby the overall heating efficiency can be enhanced significantly when an integer number of fast wave wavelengths can be folded in between the high field side fast wave cutoff and the ion-ion hybrid layer(s) at which the ion Bernstein or ion cyclotron waves are excited. This effect was already experimentally identified in (3He)-D plasmas [2] and was recently tested in (3He)-H JET plasmas. The latter is an `inverted' scenario, which differs significantly from the (3He)-D scenarios since the mode-conversion layer is positioned between the low field side edge of the plasma and the ion-cyclotron layer of the minority 3He ions (whereas the order in which a wave entering the plasma from the low field side encounters these layers is inverted in a `regular' scenario), and because much lower 3He concentrations are needed to achieve the mode-conversion heating regime. The presence of small amounts of 4He and D in the discharges gave rise to an additional mode conversion layer on top of the expected one associated with 3He-H, which made the interpretation of the results more complex but also more interesting: Three different regimes could be distinguished as a function of X[3He], and the differing dynamics at the various concentrations could be traced back to the presence of these two mode conversion layers and their associated fast wave cutoffs. Whereas (1-D and 2-D) numerical modeling yields quantitative information on the RF absorptivity, recent analytical work by Kazakov [3] permits to grasp the dominant underlying wave interaction physics.

  19. Enhanced efficiency of plasma acceleration in the laser-induced cavity pressure acceleration scheme

    Science.gov (United States)

    Badziak, J.; Rosiński, M.; Jabłoński, S.; Pisarczyk, T.; Chodukowski, T.; Parys, P.; Rączka, P.; Krousky, E.; Ullschmied, J.; Liska, R.; Kucharik, M.

    2015-01-01

    Among various methods for the acceleration of dense plasmas the mechanism called laser-induced cavity pressure acceleration (LICPA) is capable of achieving the highest energetic efficiency. In the LICPA scheme, a projectile placed in a cavity is accelerated along a guiding channel by the laser-induced thermal plasma pressure or by the radiation pressure of an intense laser radiation trapped in the cavity. This arrangement leads to a significant enhancement of the hydrodynamic or electromagnetic forces driving the projectile, relative to standard laser acceleration schemes. The aim of this paper is to review recent experimental and numerical works on LICPA with the emphasis on the acceleration of heavy plasma macroparticles and dense ion beams. The main experimental part concerns the research carried out at the kilojoule sub-nanosecond PALS laser facility in Prague. Our measurements performed at this facility, supported by advanced two-dimensional hydrodynamic simulations, have demonstrated that the LICPA accelerator working in the long-pulse hydrodynamic regime can be a highly efficient tool for the acceleration of heavy plasma macroparticles to hyper-velocities and the generation of ultra-high-pressure (>100 Mbar) shocks through the collision of the macroparticle with a solid target. The energetic efficiency of the macroparticle acceleration and the shock generation has been found to be significantly higher than that for other laser-based methods used so far. Using particle-in-cell simulations it is shown that the LICPA scheme is highly efficient also in the short-pulse high-intensity regime and, in particular, may be used for production of intense ion beams of multi-MeV to GeV ion energies with the energetic efficiency of tens of per cent, much higher than for conventional laser acceleration schemes.

  20. Monitoring Delamination of Plasma-Sprayed Thermal Barrier Coatings by Reflectance-Enhanced Luminescence

    Science.gov (United States)

    Eldridge, Jeffrey I.; Bencic, Timothy J.

    2006-01-01

    Highly scattering plasma-sprayed thermal barrier coatings (TBCs) present a challenge for optical diagnostic methods to monitor TBC delamination because scattering attenuates light transmitted through the TBC and usually degrades contrast between attached and delaminated regions of the TBC. This paper presents a new approach where reflectance-enhanced luminescence from a luminescent sublayer incorporated along the bottom of the TBC is used to identify regions of TBC delamination. Because of the higher survival rate of luminescence reflecting off the back surface of a delaminated TBC, the strong scattering exhibited by plasma-sprayed TBCs actually accentuates contrast between attached and delaminated regions by making it more likely that multiple reflections of luminescence off the back surface occur before exiting the top surface of the TBC. A freestanding coating containing sections designed to model an attached or delaminated TBC was prepared by depositing a luminescent Eu-doped or Er-doped yttria-stabilized zirconia (YSZ) luminescent layer below a plasma-sprayed undoped YSZ layer and utilizing a NiCr backing layer to represent an attached substrate. For specimens with a Eu-doped YSZ luminescent sublayer, luminescence intensity maps showed excellent contrast between unbacked and NiCr-backed sections even at a plasma-sprayed overlayer thickness of 300 m. Discernable contrast between unbacked and NiCr-backed sections was not observed for specimens with a Er-doped YSZ luminescent sublayer because luminescence from Er impurities in the undoped YSZ layer overwhelmed luminescence originating form the Er-doped YSZ sublayer.

  1. Practical silicon deposition rules derived from silane monitoring during plasma-enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Bartlome, Richard, E-mail: richard.bartlome@alumni.ethz.ch; De Wolf, Stefaan; Demaurex, Bénédicte; Ballif, Christophe [Ecole Polytechnique Fédérale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and Thin-Film Electronics Laboratory, Rue de la Maladière 71b, 2000 Neuchâtel (Switzerland); Amanatides, Eleftherios; Mataras, Dimitrios [University of Patras, Department of Chemical Engineering, Plasma Technology Laboratory, P.O. Box 1407, 26504 Patras (Greece)

    2015-05-28

    We clarify the difference between the SiH{sub 4} consumption efficiency η and the SiH{sub 4} depletion fraction D, as measured in the pumping line and the actual reactor of an industrial plasma-enhanced chemical vapor deposition system. In the absence of significant polysilane and powder formation, η is proportional to the film growth rate. Above a certain powder formation threshold, any additional amount of SiH{sub 4} consumed translates into increased powder formation rather than into a faster growing Si film. In order to discuss a zero-dimensional analytical model and a two-dimensional numerical model, we measure η as a function of the radio frequency (RF) power density coupled into the plasma, the total gas flow rate, the input SiH{sub 4} concentration, and the reactor pressure. The adjunction of a small trimethylboron flow rate increases η and reduces the formation of powder, while the adjunction of a small disilane flow rate decreases η and favors the formation of powder. Unlike η, D is a location-dependent quantity. It is related to the SiH{sub 4} concentration in the plasma c{sub p}, and to the phase of the growing Si film, whether the substrate is glass or a c-Si wafer. In order to investigate transient effects due to the RF matching, the precoating of reactor walls, or the introduction of a purifier in the gas line, we measure the gas residence time and acquire time-resolved SiH{sub 4} density measurements throughout the ignition and the termination of a plasma.

  2. Cold Vacuum Drying (CVD) Set Point Determination

    Energy Technology Data Exchange (ETDEWEB)

    PHILIPP, B.L.

    2000-01-12

    This document provides the calculations used to determine the error of safety class signals used for the CVD process These errors are used with the Parameter limits to arrive at the initial set point. The Safety Class Instrumentation and Control (SCIC) system provides active detection and response to process anomalies that, if unmitigated would result in a safety event. Specifically actuation of the SCIC system includes two portions. The portion which isolates the MCO and initiates the safety-class helium (SCHe) purge, and the portion which detects and stops excessive heat input to the MCO on high tempered water MCO inlet temperature. For the MCO isolation and purge the SCIC receives signals from MCO pressure (both positive pressure and vacuum) helium flow rate, bay high temperature switches, seismic trips and time under vacuum trips.

  3. CVD diamond sensors for charged particle detection

    CERN Document Server

    Krammer, Manfred; Berdermann, E; Bergonzo, P; Bertuccio, G; Bogani, F; Borchi, E; Brambilla, A; Bruzzi, Mara; Colledani, C; Conway, J; D'Angelo, P; Dabrowski, W; Delpierre, P A; Dencuville, A; Dulinski, W; van Eijk, B; Fallou, A; Fizzotti, F; Foulon, F; Friedl, M; Gan, K K; Gheeraert, E; Hallewell, G D; Han, S; Hartjes, F G; Hrubec, Josef; Husson, D; Kagan, H; Kania, D R; Kaplon, J; Kass, R; Koeth, T W; Lo Giudice, A; Lü, R; MacLynne, L; Manfredotti, C; Meier, D; Mishina, M; Moroni, L; Oh, A; Pan, L S; Pernicka, Manfred; Peitz, A; Perera, L P; Pirollo, S; Procario, M; Riester, J L; Roe, S; Rousseau, L; Rudge, A; Russ, J; Sala, S; Sampietro, M; Schnetzer, S; Sciortino, S; Stelzer, H; Stone, R; Suter, B; Tapper, R J; Tesarek, R; Trischuk, W; Tromson, D; Vittone, E; Walsh, A M; Wedenig, R; Weilhammer, Peter; Wetstein, M; White, C; Zeuner, W; Zöller, M

    2001-01-01

    CVD diamond material was used to build position-sensitive detectors for single-charged particles to be employed in high-intensity physics experiments. To obtain position information, metal contacts shaped as strips or pixels are applied to the detector surface for one- or two- dimensional coordinate measurement. Strip detectors 2*4 cm/sup 2/ in size with a strip distance of 50 mu m were tested. Pixel detectors of various pixel sizes were bump bonded to electronics chips and investigated. A key issue for the use of these sensors in high intensity experiments is the radiation hardness. Several irradiation experiments were carried out with pions, protons and neutrons exceeding a fluence of 10/sup 15/ particles/cm/sup 2/. The paper presents an overview of the results obtained with strip and pixel detectors in high-energy test beams and summarises the irradiation studies. (8 refs).

  4. Premature menopause linked to CVD and osteoporosis.

    Science.gov (United States)

    Park, Claire; Overton, Caroline

    2010-03-01

    Premature menopause affects 1% of women under the age of 40, the usual age of the menopause is 51. Most women will present with irregular periods or no periods at all with or without climacteric symptoms. Around 10% of women present with primary amenorrhoea. A careful history and examination are required. It is important to ask specifically about previous chemotherapy or radiotherapy and to look for signs of androgen excess e.g. polycystic ovarian syndrome, adrenal problems e.g. galactorrhoea and thyroid goitres. Once pregnancy has been excluded, a progestagen challenge test can be performed in primary care. Norethisterone 5 mg tds po for ten days or alternatively medroxyprogesterone acetate 10 mg daily for ten days is prescribed. A withdrawal bleed within a few days of stopping the norethisterone indicates the presence of oestrogen and bleeding more than a few drops is considered a positive withdrawal bleed. The absence of a bleed indicates low levels of oestrogen, putting the woman at risk of CVD and osteoporosis. FSH levels above 30 IU/l are an indicator that the ovaries are failing and the menopause is approaching or has occurred. It should be remembered that FSH levels fluctuate during the month and from one month to the next, so a minimum of two measurements should be made at least four to six weeks apart. The presence of a bleed should not exclude premature menopause as part of the differential diagnosis as there can be varying and unpredictable ovarian function remaining. The progestagen challenge test should not be used alone, but in conjunction with FSH, LH and oestradiol. There is no treatment for premature menopause. Women desiring pregnancy should be referred to a fertility clinic and discussion of egg donation. Women not wishing to become pregnant should be prescribed HRT until the age of 50 to control symptoms of oestrogen deficiency and reduce the risks of osteoporosis and CVD.

  5. Aligned carbon nanotubes catalytically grown on iron-based nanoparticles obtained by laser-induced CVD

    Energy Technology Data Exchange (ETDEWEB)

    Le Normand, F. [Groupe Surfaces and Interfaces, IPCMS, UMR 7504 CNRS, Bat 70, 23 rue du Loess, 67034 Strasbourg Cedex (France)], E-mail: Francois.Le-Normand@ipcms.u-strasbg.fr; Cojocaru, C.S.; Ersen, O. [Groupe Surfaces and Interfaces, IPCMS, UMR 7504 CNRS, Bat 70, 23 rue du Loess, 67034 Strasbourg Cedex (France); Legagneux, P.; Gangloff, L. [THALES R and T, Departementale 128, 91747 Palaiseau Cedex (France); Fleaca, C. [Groupe Surfaces and Interfaces, IPCMS, UMR 7504 CNRS, Bat 70, 23 rue du Loess, 67034 Strasbourg Cedex (France); National Institute for Lasers, Plasma and Radiation Physics, Laser Department, P.O. Box MG-36, R-76900 Bucharest (Romania); Alexandrescu, R.; Dumitrache, F.; Morjan, I. [National Institute for Lasers, Plasma and Radiation Physics, Laser Department, P.O. Box MG-36, R-76900 Bucharest (Romania)

    2007-12-15

    Iron-based nanoparticles are prepared by a laser-induced chemical vapor deposition (CVD) process. They are characterized as body-centered Fe and Fe{sub 2}O{sub 3} (maghemite/magnetite) particles with sizes {<=}5 and 10 nm, respectively. The Fe particles are embedded in a protective carbon matrix. Both kind of particles are dispersed by spin-coating on SiO{sub 2}/Si(1 0 0) flat substrates. They are used as catalyst to grow carbon nanotubes by a plasma- and filaments-assisted catalytic CVD process (PE-HF-CCVD). Vertically oriented and thin carbon nanotubes (CNTs) were grown with few differences between the two samples, except the diameter in relation to the initial size of the iron particles, and the density. The electron field emission of these samples exhibit quite interesting behavior with a low turn-on voltage at around 1 V/{mu}m.

  6. Aligned carbon nanotubes catalytically grown on iron-based nanoparticles obtained by laser-induced CVD

    Science.gov (United States)

    Le Normand, F.; Cojocaru, C. S.; Ersen, O.; Legagneux, P.; Gangloff, L.; Fleaca, C.; Alexandrescu, R.; Dumitrache, F.; Morjan, I.

    2007-12-01

    Iron-based nanoparticles are prepared by a laser-induced chemical vapor deposition (CVD) process. They are characterized as body-centered Fe and Fe 2O 3 (maghemite/magnetite) particles with sizes ≤5 and 10 nm, respectively. The Fe particles are embedded in a protective carbon matrix. Both kind of particles are dispersed by spin-coating on SiO 2/Si(1 0 0) flat substrates. They are used as catalyst to grow carbon nanotubes by a plasma- and filaments-assisted catalytic CVD process (PE-HF-CCVD). Vertically oriented and thin carbon nanotubes (CNTs) were grown with few differences between the two samples, except the diameter in relation to the initial size of the iron particles, and the density. The electron field emission of these samples exhibit quite interesting behavior with a low turn-on voltage at around 1 V/μm.

  7. Rare genetic variants associated with early onset CVD

    NARCIS (Netherlands)

    Maiwald, S.

    2015-01-01

    Cardiovascular disease (CVD) is the major cause of morbidity and mortality in Western societies. CVD is mainly triggered by atherosclerosis. A combination of lipid accumulation, inflammation at the vessel wall and thrombotic reactions are underlying its pathobiology. Despite improvements in the ther

  8. Prevention: Reducing the risk of CVD in patients with periodontitis.

    Science.gov (United States)

    Genco, Robert J; Van Dyke, Thomas E

    2010-09-01

    The association between periodontitis and other chronic diseases, such as cardiovascular disease (CVD) and type 2 diabetes mellitus, could be related to systemic inflammation initiated by a local inflammatory challenge. Oliveira et al. have added lack of oral hygiene, and its link with systemic inflammation, to the spectrum of risk factors for CVD.

  9. Heat transfer model of an iCVD reactor

    NARCIS (Netherlands)

    Bakker, R.; Verlaan, V.; Verkerk, A.D.; van der Werf, C.H.M.; van Dijk, L.; Rudolph, H.; Rath, J.K.; Schropp, R.E.I.

    2009-01-01

    Contrary to conventional HWCVD, the power consumption in the iCVD process is dominated by heat conduction rather than radiation. This is due to the fact that while the typical wire temperature for HWCVD is about 1750–2200 °C, for iCVD the temperature is only 250–500 °C. Typical deposition pressures

  10. Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition

    Science.gov (United States)

    Dendooven, Jolien; Solano, Eduardo; Minjauw, Matthias M.; Van de Kerckhove, Kevin; Coati, Alessandro; Fonda, Emiliano; Portale, Giuseppe; Garreau, Yves; Detavernier, Christophe

    2016-11-01

    We report the design of a mobile setup for synchrotron based in situ studies during atomic layer processing. The system was designed to facilitate in situ grazing incidence small angle x-ray scattering (GISAXS), x-ray fluorescence (XRF), and x-ray absorption spectroscopy measurements at synchrotron facilities. The setup consists of a compact high vacuum pump-type reactor for atomic layer deposition (ALD). The presence of a remote radio frequency plasma source enables in situ experiments during both thermal as well as plasma-enhanced ALD. The system has been successfully installed at different beam line end stations at the European Synchrotron Radiation Facility and SOLEIL synchrotrons. Examples are discussed of in situ GISAXS and XRF measurements during thermal and plasma-enhanced ALD growth of ruthenium from RuO4 (ToRuS™, Air Liquide) and H2 or H2 plasma, providing insights in the nucleation behavior of these processes.

  11. Broadband wide-angle absorption enhancement due to mode conversion in cold unmagnetized plasmas with periodic density variations

    CERN Document Server

    Yu, Dae Jung

    2016-01-01

    We study theoretically the mode conversion and the associated resonant absorption of p-polarized electromagnetic waves into longitudinal plasma oscillations in cold, unmagnetized and stratified plasmas with periodic spatial density variations. We consider sinusoidal density configurations for which the frequency band where mode conversion occurs is well included within a transmission band of the one-dimensional plasma photonic crystal. We calculate the mode conversion coefficient, which measures the fraction of the electromagnetic wave energy absorbed into the plasma, and the spatial distribution of the magnetic field intensity for various values of the wave frequency and the incident angle using the invariant imbedding theory of mode conversion. We find that the absorption is greatly enhanced over a wide range of frequency and incident angle due to the interplay between the mode conversion and the photonic band structure. The enhancement occurs because for frequencies within a transmission band, the wave ref...

  12. Plasma-enhanced atomic-layer-deposited MoO{sub x} emitters for silicon heterojunction solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Ziegler, Johannes; Schneider, Thomas; Sprafke, Alexander N. [Martin-Luther-University Halle-Wittenberg, mu-MD Group, Institute of Physics, Halle (Germany); Mews, Mathias; Korte, Lars [Helmholtz-Zentrum Berlin fuer Materialien und Energie GmbH, Institute for Silicon-Photovoltaics, Berlin (Germany); Kaufmann, Kai [Fraunhofer Center for Silicon Photovoltaics CSP, Halle (Germany); University of Applied Sciences, Hochschule Anhalt Koethen, Koethen (Germany); Wehrspohn, Ralf B. [Martin-Luther-University Halle-Wittenberg, mu-MD Group, Institute of Physics, Halle (Germany); Fraunhofer Institute for Mechanics of Materials IWM Halle, Halle (Germany)

    2015-09-15

    A method for the deposition of molybdenum oxide (MoO{sub x}) with high growth rates at temperatures below 200 C based on plasma-enhanced atomic layer deposition is presented. The stoichiometry of the over-stoichiometric MoO{sub x} films can be adjusted by the plasma parameters. First results of these layers acting as hole-selective contacts in silicon heterojunction solar cells are presented and discussed. (orig.)

  13. Titanium surface modification by using microwave-induced argon plasma in various conditions to enhance osteoblast biocompatibility

    OpenAIRE

    Seon, Gyeung Mi; Seo, Hyok Jin; Kwon, Soon Young; Lee, Mi Hee; Kwon, Byeong-Ju; Kim, Min Sung; Koo, Min-Ah; Park, Bong Joo; Park,Jong-Chul

    2015-01-01

    Background Titanium is a well proven implantable material especially for osseointegratable implants by its biocompatibility and anti-corrosive surface properties. Surface characteristics of the implant play an important role for the evolution of bone tissue of the recipient site. Among the various surface modification methods, plasma treatment is one of the promising methods for enhance biocompatibility. We made microwave-induced argon plasma at atmospheric pressure to improve in titanium sur...

  14. Enhancing gas-phase reaction in a plasma using high intensity and high power ultrasonic acoustic waves

    DEFF Research Database (Denmark)

    2010-01-01

    is absorbed into said plasma (104), and where a sound pressure level of said generated ultrasonic high intensity and high power acoustic waves (102) is at least substantially 140 dB and where an acoustic power of said generated ultrasonic high intensity and high power acoustic waves (102); is at least......This invention relates to enhancing a gas-phase reaction in a plasma comprising: creating plasma (104) by at least one plasma source (106), and wherein that the method further comprises: generating ultrasonic high intensity and high power acoustic waves (102) having a predetermined amount...... of acoustic energy by at least one ultrasonic high intensity and high power gas-jet acoustic wave generator (101), where said ultrasonic high intensity and high power acoustic waves are directed to propagate towards said plasma (104) so that at least a part of said predetermined amount of acoustic energy...

  15. Nanostructured silicon carbon thin films grown by plasma enhanced chemical vapour deposition technique

    Energy Technology Data Exchange (ETDEWEB)

    Coscia, U. [Dipartimento di Fisica, Università di Napoli “Federico II” Complesso Universitario MSA, via Cinthia, 80126 Napoli (Italy); CNISM Unita' di Napoli, Complesso Universitario MSA, via Cinthia, 80126 Napoli (Italy); Ambrosone, G., E-mail: ambrosone@na.infn.it [Dipartimento di Fisica, Università di Napoli “Federico II” Complesso Universitario MSA, via Cinthia, 80126 Napoli (Italy); SPIN-CNR, Complesso Universitario MSA, via Cinthia, 80126 Napoli (Italy); Basa, D.K. [Department of Physics, Utkal University, Bhubaneswar 751004 (India); Rigato, V. [INFN Laboratori Nazionali Legnaro, 35020 Legnaro (Padova) (Italy); Ferrero, S.; Virga, A. [Dipartimento di Scienza Applicata e Tecnologia, Politecnico di Torino, C.so Duca degli Abruzzi 24, 10129 Torino (Italy)

    2013-09-30

    Nanostructured silicon carbon thin films, composed of Si nanocrystallites embedded in hydrogenated amorphous silicon carbon matrix, have been prepared by varying rf power in ultra high vacuum plasma enhanced chemical vapour deposition system using silane and methane gas mixtures diluted in hydrogen. In this paper we have studied the compositional, structural and electrical properties of these films as a function of rf power. It is shown that with increasing rf power the atomic densities of carbon and hydrogen increase while the atomic density of silicon decreases, resulting in a reduction in the mass density. Further, it is demonstrated that carbon is incorporated into amorphous matrix and it is mainly bonded to silicon. The study has also revealed that the crystalline volume fraction decreases with increase in rf power and that the films deposited with low rf power have a size distribution of large and small crystallites while the films deposited with relatively high power have only small crystallites. Finally, the enhanced transport properties of the nanostructured silicon carbon films, as compared to amorphous counterpart, have been attributed to the presence of Si nanocrystallites. - Highlights: • The mass density of silicon carbon films decreases from 2.3 to 2 g/cm{sup 3}. • Carbon is incorporated in the amorphous phase and it is mainly bonded to silicon. • Nanostructured silicon carbon films are deposited at rf power > 40 W. • Si nanocrystallites in amorphous silicon carbon enhance the electrical properties.

  16. Plasma-Wave Enhanced THz-Performance of a Nanometer Side-Gated Transistor

    Directory of Open Access Journals (Sweden)

    K. Y. Xu

    2014-07-01

    Full Text Available By using a two-dimensional-three-dimensional (2D-3D combined ensemble Monte Carlo (EMC model, the performance of a nanometer side-gated transistor is studied at terahertz (THz region. The transistor is based on a GaN/AlGaN heterosturcture at whose hetero-interface a two-dimensional electron gas (2DEG is formed. And the side-gate of the transistor is intentionally designed as an insulating trench with a 2DEG area in the center. Simulation results reveal that at low working frequency the performances of the transistor are almost frequency independent. However when the working frequency reaches THz region, obvious enhancements of the performances have been observed. The enhancements are accompanied by two peaks respectively at the frequency of about 4 THz and 6 THz. As such, the frequency-dependent performances become frequency nonmonotonic. Further analysis shows that the performance enhancements can be attributed to the excitations of 2D plasma waves in the side-gate which including a 2DEG area in its center.

  17. Plasma gelsolin improves lung host defense against pneumonia by enhancing macrophage NOS3 function.

    Science.gov (United States)

    Yang, Zhiping; Chiou, Terry Ting-Yu; Stossel, Thomas P; Kobzik, Lester

    2015-07-01

    Plasma gelsolin (pGSN) functions as part of the "extracellular actin-scavenging system," but its potential to improve host defense against infection has not been studied. In a mouse model of primary pneumococcal pneumonia, recombinant human pGSN (rhu-pGSN) caused enhanced bacterial clearance, reduced acute inflammation, and improved survival. In vitro, rhu-pGSN rapidly improved lung macrophage uptake and killing of bacteria (Streptococcus pneumoniae, Escherichia coli, and Francisella tularensis). pGSN triggers activating phosphorylation (Ser(1177)) of macrophage nitric oxide synthase type III (NOS3), an enzyme with important bactericidal functions in lung macrophages. rhu-pGSN failed to enhance bacterial killing by NOS3(-/-) macrophages in vitro or bacterial clearance in NOS3(-/-) mice in vivo. Prophylaxis with immunomodulators may be especially relevant for patients at risk for secondary bacterial pneumonia, e.g., after influenza. Treatment of mice with pGSN challenged with pneumococci on postinfluenza day 7 (the peak of enhanced susceptibility to secondary infection) caused a ∼15-fold improvement in bacterial clearance, reduced acute neutrophilic inflammation, and markedly improved survival, even without antibiotic therapy. pGSN is a potential immunomodulator for improving lung host defense against primary and secondary bacterial pneumonia. Copyright © 2015 the American Physiological Society.

  18. Characteristics of silicon nitride deposited by VHF (162 MHz)-plasma enhanced chemical vapor deposition using a multi-tile push-pull plasma source

    Science.gov (United States)

    Kim, Ki Seok; Sirse, Nishant; Kim, Ki Hyun; Rogers Ellingboe, Albert; Kim, Kyong Nam; Yeom, Geun Young

    2016-10-01

    To prevent moisture and oxygen permeation into flexible organic electronic devices formed on substrates, the deposition of an inorganic diffusion barrier material such as SiN x is important for thin film encapsulation. In this study, by a very high frequency (162 MHz) plasma-enhanced chemical vapor deposition (VHF-PECVD) using a multi-tile push-pull plasma source, SiN x layers were deposited with a gas mixture of NH3/SiH4 with/without N2 and the characteristics of the plasma and the deposited SiN x film as the thin film barrier were investigated. Compared to a lower frequency (60 MHz) plasma, the VHF (162 MHz) multi-tile push-pull plasma showed a lower electron temperature, a higher vibrational temperature, and higher N2 dissociation for an N2 plasma. When a SiN x layer was deposited with a mixture of NH3/SiH4 with N2 at a low temperature of 100 °C, a stoichiometric amorphous Si3N4 layer with very low Si-H bonding could be deposited. The 300 nm thick SiN x film exhibited a low water vapor transmission rate of 1.18  ×  10-4 g (m2 · d)-1, in addition to an optical transmittance of higher than 90%.

  19. Selective adhesion of intestinal epithelial cells on patterned films with amine functionalities formed by plasma enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Kyung Seop; Choi, Changrok; Kim, Soo Heon; Choi, Kun oh [Department of Physics, Brain Korea 21 Physics Research Division and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Kim, Jeong Min [Department of Molecular Biology and Institute of Nanosensor and Biotechnology, BK21 Graduate Program for RNA Biology, Dankook University, Yongin 448-701 (Korea, Republic of); Kim, Hong Ja [Department of Internal Medicine, Dankook University College of Medicine, Cheonan 330-715 (Korea, Republic of); Yeo, Sanghak [R and D Center, ELBIO Incorporation, 426-5 Gasan-dong Geumchun-gu, Seoul (Korea, Republic of); Park, Heonyong [Department of Molecular Biology and Institute of Nanosensor and Biotechnology, BK21 Graduate Program for RNA Biology, Dankook University, Yongin 448-701 (Korea, Republic of); Jung, Donggeun, E-mail: djung@skku.ac.kr [Department of Physics, Brain Korea 21 Physics Research Division and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)

    2010-11-01

    Control of cell adhesion to surfaces is important to develop analytical tools in the areas of biomedical engineering. To control cell adhesiveness of the surface, we constructed a variety of plasma polymerized hexamethyldisiloxane (PPHMDSO) thin films deposited at the plasma power range of 10-100 W by plasma enhanced chemical vapor deposition (PECVD). The PPHMDSO film that was formed at 10 W was revealed to be resistant to cell adhesion. The resistance to cell adhesion is closely related to physicochemical properties of the film. Atomic force microscopic data show an increase in surface roughness from 0.52 nm to 0.74 nm with increasing plasma power. From Fourier transform infrared (FT-IR) absorption spectroscopy data, it was also determined that the methyl (-CH{sub 3}) peak intensity increases with increasing plasma power, whereas the hydroxyl (-OH) peak decreases. X-ray photoelectron spectroscopy data reveal an increase in C-O bonding with increasing plasma power. These results suggest that C-O bonding and hydroxyl (-OH) and methyl (-CH{sub 3}) functional groups play a critical part in cell adhesion. Furthermore, to enhance a diversity of film surface, we accumulated the patterned plasma polymerized ethylenediamine (PPEDA) thin film on the top of the PPHMDSO thin film. The PPEDA film is established to be strongly cell-adherent. This patterned two-layer film stacking method can be used to form the selectively limited cell-adhesive PPEDA spots over the adhesion-resistant surface.

  20. Modelling and optimization of film thickness variation for plasma enhanced chemical vapour deposition processes

    Science.gov (United States)

    Waddell, Ewan; Gibson, Des; Lin, Li; Fu, Xiuhua

    2011-09-01

    This paper describes a method for modelling film thickness variation across the deposition area within plasma enhanced chemical vapour deposition (PECVD) processes. The model enables identification and optimization of film thickness uniformity sensitivities to electrode configuration, temperature, deposition system design and gas flow distribution. PECVD deposition utilizes a co-planar 300mm diameter electrodes with separate RF power matching to each electrode. The system has capability to adjust electrode separation and electrode temperature as parameters to optimize uniformity. Vacuum is achieved using dry pumping with real time control of butterfly valve position for active pressure control. Comparison between theory and experiment is provided for PECVD of diamond-like-carbon (DLC) deposition onto flat and curved substrate geometries. The process utilizes butane reactive feedstock with an argon carrier gas. Radiofrequency plasma is used. Deposited film thickness sensitivities to electrode geometry, plasma power density, pressure and gas flow distribution are demonstrated. Use of modelling to optimise film thickness uniformity is demonstrated. Results show DLC uniformity of 0.30% over a 200 mm flat zone diameter within overall electrode diameter of 300mm. Thickness uniformity of 0.75% is demonstrated over a 200mm diameter for a non-conformal substrate geometry. Use of the modelling method for PECVD using metal-organic chemical vapour deposition (MOCVD) feedstock is demonstrated, specifically for deposition of silica films using metal-organic tetraethoxy-silane. Excellent agreement between experimental and theory is demonstrated for conformal and non-conformal geometries. The model is used to explore scalability of PECVD processes and trade-off against film thickness uniformity. Application to MEMS, optical coatings and thin film photovoltaics is discussed.

  1. MICROSTRUCTURE OF SiOx:H FILMS PREPARED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

    Institute of Scientific and Technical Information of China (English)

    MA ZHI-XUN; LIAO XIAN-BO; KONG GUANG-LIN; CHU JUN-HAO

    2000-01-01

    The micro-Raman spectroscopy and infrared (IR) spectroscopy have been performed for the study of the microstructure of amorphous hydrogenated oxidized silicon (a-SiOx:H) films prepared by Plasma Enhanced Chemical Vapor Deposition technique. It is found that a-SiOx :H consists of two phases: an amorphous silicon-rich phase and an oxygen-rich phase mainly comprised of HSi-SiO2 and HSi-O3. The Raman scattering results exhibit that the frequency of TO-like mode of amorphous silicon red-shifts with decreasing size of silicon-rich region. This is related to the quantum confinement effects, similar to the nanocrystalline silicon.

  2. Microwave plasma-enhanced chemical vapour deposition growth of carbon nanostructures

    Directory of Open Access Journals (Sweden)

    Shivan R. Singh

    2010-05-01

    Full Text Available The effect of various input parameters on the production of carbon nanostructures using a simple microwave plasma-enhanced chemical vapour deposition technique has been investigated. The technique utilises a conventional microwave oven as the microwave energy source. The developed apparatus is inexpensive and easy to install and is suitable for use as a carbon nanostructure source for potential laboratory-based research of the bulk properties of carbon nanostructures. A result of this investigation is the reproducibility of specific nanostructures with the variation of input parameters, such as carbon-containing precursor and support gas flow rate. It was shown that the yield and quality of the carbon products is directly controlled by input parameters. Transmission electron microscopy and scanning electron microscopy were used to analyse the carbon products; these were found to be amorphous, nanotubes and onion-like nanostructures.

  3. Enhancement in the electromagnetic beam-plasma instability due to ion streaming

    Science.gov (United States)

    Shukla, Nitin; Stockem, A.; Fiúza, F.; Silva, L. O.

    2012-04-01

    We investigate the Weibel instability in counter-propagating electron-ion plasmas with focus on the ion contribution, considering a realistic mass ratio. A generalized dispersion relation is derived from the relativistic theory by assuming an initially anisotropic temperature, which is represented by a waterbag distribution in momentum space, which shows an enhanced growth rate due to ion response. Two-dimensional particle-in-cell simulations support the theoretical analysis, showing a further amplification of magnetic field on ion time scale. The effect of an initial anisotropic temperature is investigated showing that the growth rate is monotonously decreased if the transverse spread is increased. Nevertheless, the presence of ions generates that the instability can develop for significantly higher electron temperatures. Suppression of oblique mode is also explored by introducing a parallel velocity spread.

  4. Plasma-enhanced growth, composition, and refractive index of silicon oxy-nitride films

    DEFF Research Database (Denmark)

    Mattsson, Kent Erik

    1995-01-01

    Secondary ion mass spectrometry and refractive index measurements have been carried out on silicon oxy-nitride produced by plasma-enhanced chemical vapor deposition (PECVD). Nitrous oxide and ammonia were added to a constant flow of 2% silane in nitrogen, to produce oxy-nitride films with atomic...... nitrogen concentrations between 2 and 10 at. %. A simple atomic valence model is found to describe both the measured atomic concentrations and published material compositions for silicon oxy-nitride produced by PECVD. A relation between the Si–N bond concentration and the refractive index is found....... This relation suggest that the refractive index of oxy-nitride with a low nitrogen concentration is determined by the material density. It is suggested that the relative oxygen concentration in the gas flow is the major deposition characterization parameter, and that water vapor is the predominant reaction by...

  5. High quality plasma-enhanced chemical vapor deposited silicon nitride films

    Energy Technology Data Exchange (ETDEWEB)

    Cotler, T.J.; Chapple-Sokol, J. (IBM General Technology Division, Hopewell Junction, NY (United States))

    1993-07-01

    The qualities of plasma-enhanced chemical vapor deposited (PECVD) silicon nitride films can be improved by increasing the deposition temperature. This report compares PECVD silicon nitride films to low pressure chemical vapor deposited (LPCVD) films. The dependence of the film properties on process parameters, specifically power and temperature, are investigated. The stress is shown to shift from tensile to compressive with increasing temperature and power. The deposition rate, uniformity, wet etch rate, index of refraction, composition, stress, hydrogen content, and conformality are considered to evaluate the film properties. Temperature affects the hydrogen content in the films by causing decreased incorporation of N-H containing species whereas the dependence on power is due to changes in the gas-phase precursors. All PECVD film properties, with the exception of conformality, are comparable to those of LPCVD films.

  6. Large enhancement in high-energy photoionization of Fe XVII and missing continuum plasma opacity

    CERN Document Server

    Nahar, Sultana N

    2016-01-01

    Aimed at solving the outstanding problem of solar opacity, and radiation transport plasma models in general, we report substantial photoabsorption in the high-energy regime due to atomic core photo-excitations not heretofore considered. In extensive R-Matrix calculations of unprecedented complexity for an important iron ion Fe xvii (Fe$^{16+}$), with a wave function expansion of 99 Fe xviii (Fe$^{17+}$) LS core states from $n \\leq 4$ complexes (equivalent to 218 fine structure levels), we find: i) up to orders of magnitude enhancement in background photoionization cross sections, in addition to strongly peaked photo-excitation-of-core resonances not considered in current opacity models, and ii) demonstrate convergence with respect to successive core excitations. The resulting increase in the monochromatic continuum, and 35% in the Rosseland Mean Opacity, are compared with the "higher-than-predicted" iron opacity measured at the Sandia Z-pinch fusion device at solar interior conditions.

  7. Catalysis Conversion Methane into C2 Hydrocarbons via Electric Field Enhanced Plasma

    Institute of Scientific and Technical Information of China (English)

    Bao Wei WANG; Gen Hui XU

    2003-01-01

    In this paper the effect of catalyst and carrier in electric field enhanced plasma on methane conversion into C2 hydrocarbons was investigated. Methane coupling reaction was studied in the system of continuous flow reactor on Ni, MoO3, MnO2 catalysts and different ZSM-5 carriers. The per pass conversion of methane can be as high as 22%, the selectivity of ethylene can be as high as 23.8%, of acetylene 60.8%, of ethane 5.4% and of total C2 hydrocarbons was more than 90%. ZSM-5-25 was the better carrier and MnO2 was the better active component. The efficiency of energy was as high as 7.81%.

  8. Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition

    Institute of Scientific and Technical Information of China (English)

    YAO Kailun; ZHENG Jianwan; LIU Zuli; JIA Lihui

    2007-01-01

    In this paper,the characterization of thin films,deposited with the precursor ferrocene(FcH)by the plasma enhanced chemical vapour deposition(PECVD)technique,was investigated.The films were measured by Scanning Electronic Microscopy(SEM),Atomic Force Microscopy(AFM),Electron Spectroscopy for Chemical Analysis(ESCA),and superconducting Quantum Interference Device(SQUID).It was observed that the film's layer is homogeneous in thickness and has a dense morphology without cracks.The surface roughness is about 36 nm.From the results of ESCA,it can be inferred that the film mainly contains the compound FeOOH,and carbon is combined with oxygen in different forms under different supply-powers.The hysteresis loops indicate that the film is of soft magnetism.

  9. Preparation of carbon nanotubes with different morphology by microwave plasma enhanced chemical vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Duraia, El-Shazly M. [Suez Canal University, Faculty of Science, Physics Department, Ismailia (Egypt); Al-Farabi Kazakh National University, 71 Al-Farabi av., 050038 Almaty (Kazakhstan); Institute of Physics and Technology, Ibragimov Street 11, 050032 Almaty (Kazakhstan); Mansurov, Zulkhair [Al-Farabi Kazakh National University, 71 Al-Farabi av., 050038 Almaty (Kazakhstan); Tokmoldin, S.Zh. [Institute of Physics and Technology, Ibragimov Street 11, 050032 Almaty (Kazakhstan)

    2010-04-15

    In this work we present a part of our results about the preparation of carbon nanotube with different morphologies by using microwave plasma enhanced chemical vapour deposition MPECVD. Well aligned, curly, carbon nanosheets, coiled carbon sheets and carbon microcoils have been prepared. We have investigated the effect of the different growth condition parameters such as the growth temperature, pressure and the hydrogen to methane flow rate ratio on the morphology of the carbon nanotubes. The results showed that there is a great dependence of the morphology of carbon nanotubes on these parameters. The yield of the carbon microcoils was high when the growth temperature was 700 C. There is a linear relation between the growth rate and the methane to hydrogen ratio. The effect of the gas pressure on the CNTs was also studied. Our samples were investigated by scanning electron microscope and Raman spectroscopy (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  10. Characterization of doped hydrogenated nanocrystalline silicon films prepared by plasma enhanced chemical vapour deposition

    Institute of Scientific and Technical Information of China (English)

    Wang Jin-Liang; Wu Er-Xing

    2007-01-01

    The B-and P-doped hydrogenated nanocrystalline silicon films (nc-Si:H) are prepared by plasma-enhanced chemical vapour deposition (PECVD) .The microstructures of doped nc-Si:H films are carefully and systematically char acterized by using high resolution electron microscopy (HREM) ,Raman scattering,x-ray diffraction (XRD) ,Auger electron spectroscopy (AES) ,and resonant nucleus reaction (RNR) .The results show that as the doping concentration of PH3 increases,the average grain size (d) tends to decrease and the crystalline volume percentage (Xc) increases simultaneously.For the B-doped samples,as the doping concentration of B2H6 increases,no obvious change in the value of d is observed,but the value of Xc is found to decrease.This is especially apparent in the case of heavy B2H6 doped samples,where the films change from nanocrystalline to amorphous.

  11. Silicon dioxide mask by plasma enhanced atomic layer deposition in focused ion beam lithography

    Science.gov (United States)

    Liu, Zhengjun; Shah, Ali; Alasaarela, Tapani; Chekurov, Nikolai; Savin, Hele; Tittonen, Ilkka

    2017-02-01

    In this work, focused ion beam (FIB) lithography was developed for plasma enhanced atomic layer deposited (PEALD) silicon dioxide SiO2 hard mask. The PEALD process greatly decreases the deposition temperature of the SiO2 hard mask. FIB Ga+ ion implantation on the deposited SiO2 layer increases the wet etch resistivity of the irradiated region. A programmed exposure in FIB followed by development in a wet etchant enables the precisely defined nanoscale patterning. The combination of FIB exposure parameters and the development time provides greater freedom for optimization. The developed process provides high pattern dimension accuracy over the tested range of 90–210 nm. Utilizing the SiO2 mask developed in this work, silicon nanopillars with 40 nm diameter were successfully fabricated with cryogenic deep reactive ion etching and the aspect ratio reached 16:1. The fabricated mask is suitable for sub-100 nm high aspect ratio silicon structure fabrication.

  12. Functional beverage of Garcinia mangostana (mangosteen) enhances plasma antioxidant capacity in healthy adults.

    Science.gov (United States)

    Xie, Zhuohong; Sintara, Marsha; Chang, Tony; Ou, Boxin

    2015-01-01

    This study was to investigate the absorption and antioxidant effect of a mangosteen-based functional beverage in humans. The beverage contained mangosteen, aloe vera, green tea, and multivitamins. A randomized, double-blind, placebo-controlled clinical trial was conducted with generally healthy male and female subjects between 18 and 60 years of age. Ten men and 10 women participated in this study. Participants were randomly divided into two groups, treatment and placebo group. Participants received either a daily single dose (245 mL) of the beverage or a placebo. Blood samples were collected from each participant at time points 0, 1, 2, 4, and 6 h. The plasma samples were analyzed by LC/MS for α-mangostin and vitamins B2 and B5. Results indicated that the three analytes were bioavailable, with observed C max at around 1 h. The antioxidant capacity measured with the oxygen radical absorbance capacity (ORAC) assay was increased with a maximum effect of 60% after 1 h, and the elevated antioxidant level lasted at least 6 h. This study demonstrated the bioavailability of α-mangostin and B vitamins from a xanthone-rich beverage and the mechanisms of the increase in plasma antioxidant may be direct effects from antioxidants, enhancement of endogenous antioxidant activity through activation of Nrf2 pathway, and synergism of the antioxidants.

  13. Conformal encapsulation of three-dimensional, bioresorbable polymeric scaffolds using plasma-enhanced chemical vapor deposition.

    Science.gov (United States)

    Hawker, Morgan J; Pegalajar-Jurado, Adoracion; Fisher, Ellen R

    2014-10-21

    Bioresorbable polymers such as poly(ε-caprolactone) (PCL) have a multitude of potential biomaterial applications such as controlled-release drug delivery and regenerative tissue engineering. For such biological applications, the fabrication of porous three-dimensional bioresorbable materials with tunable surface chemistry is critical to maximize their surface-to-volume ratio, mimic the extracellular matrix, and increase drug-loading capacity. Here, two different fluorocarbon (FC) precursors (octofluoropropane (C3F8) and hexafluoropropylene oxide (HFPO)) were used to deposit FC films on PCL scaffolds using plasma-enhanced chemical vapor deposition (PECVD). These two coating systems were chosen with the intent of modifying the scaffold surfaces to be bio-nonreactive while maintaining desirable bulk properties of the scaffold. X-ray photoelectron spectroscopy showed high-CF2 content films were deposited on both the exterior and interior of PCL scaffolds and that deposition behavior is PECVD system specific. Scanning electron microscopy data confirmed that FC film deposition yielded conformal rather than blanket coatings as the porous scaffold structure was maintained after plasma treatment. Treated scaffolds seeded with human dermal fibroblasts (HDF) demonstrate that the cells do not attach after 72 h and that the scaffolds are noncytotoxic to HDF. This work demonstrates conformal FC coatings can be deposited on 3D polymeric scaffolds using PECVD to fabricate 3D bio-nonreactive materials.

  14. A mathematical model and simulation results of plasma enhanced chemical vapor deposition of silicon nitride films

    Science.gov (United States)

    Konakov, S. A.; Krzhizhanovskaya, V. V.

    2015-01-01

    We developed a mathematical model of Plasma Enhanced Chemical Vapor Deposition (PECVD) of silicon nitride thin films from SiH4-NH3-N2-Ar mixture, an important application in modern materials science. Our multiphysics model describes gas dynamics, chemical physics, plasma physics and electrodynamics. The PECVD technology is inherently multiscale, from macroscale processes in the chemical reactor to atomic-scale surface chemistry. Our macroscale model is based on Navier-Stokes equations for a transient laminar flow of a compressible chemically reacting gas mixture, together with the mass transfer and energy balance equations, Poisson equation for electric potential, electrons and ions balance equations. The chemical kinetics model includes 24 species and 58 reactions: 37 in the gas phase and 21 on the surface. A deposition model consists of three stages: adsorption to the surface, diffusion along the surface and embedding of products into the substrate. A new model has been validated on experimental results obtained with the "Plasmalab System 100" reactor. We present the mathematical model and simulation results investigating the influence of flow rate and source gas proportion on silicon nitride film growth rate and chemical composition.

  15. Ion acceleration enhancement in laser-generated plasmas by metallic doped hydrogenated polymers

    Directory of Open Access Journals (Sweden)

    Angela Maria Mezzasalma

    2009-05-01

    Full Text Available Laser-generated plasmas in vacuum were obtained by ablating hydrogenated polymers at the Physics Department of the University of Messina and at the PALS Laboratory in Prague. In the first case a 3 ns,532 nm Nd:Yag laser, at 1010 W/cm2 intensity was employed.In the second case a 300 ps, 438 nm iodine laser, at 5x1014W/cm2 intensity was employed. Different ion collectors were usedin a time-of-flight configuration to monitor the ejected ions from theplasma at different angles with respect to the direction normal tothe target surface. Measurements demonstrated that the mean ionvelocity, directed orthogonally to the target surface, increases forablation of polymers doped with metallic elements with respect tothe nondoped one. The possible mechanism explaining theresults can be found in the different electron density of theplasma, due to the higher number of electrons coming from the dopingelements. This charge enhancement increases the equivalent ionvoltage acceleration, i.e. the electric field generated in the non-equilibrium plasma placed in front of the ablated target surface.

  16. Facile plasma-enhanced deposition of ultrathin crosslinked amino acid films for conformal biometallization.

    Science.gov (United States)

    Anderson, Kyle D; Slocik, Joseph M; McConney, Michael E; Enlow, Jesse O; Jakubiak, Rachel; Bunning, Timothy J; Naik, Rajesh R; Tsukruk, Vladimir V

    2009-03-01

    A novel method for the facile fabrication of conformal, ultrathin, and uniform synthetic amino acid coatings on a variety of practical surfaces by plasma-enhanced chemical vapor deposition is introduced. Tyrosine, which is utilized as an agent to reduce gold nanoparticles from solution, is sublimed into the plasma field and directly deposited on a variety of substrates to form a homogeneous, conformal, and robust polyamino acid coating in a one-step, solvent-free process. This approach is applicable to many practical surfaces and allows surface-induced biometallization while avoiding multiple wet-chemistry treatments that can damage many soft materials. Moreover, by placing a mask over the substrate during deposition, the tyrosine coating can be micropatterned. Upon its exposure to a solution of gold chloride, a network of gold nanoparticles forms on the surface, replicating the initial micropattern. This method of templated biometallization is adaptable to a variety of practical inorganic and organic substrates, such as silicon, glass, nitrocellulose, polystyrene, polydimethylsiloxane, polytetrafluoroethylene, polyethylene, and woven silk fibers. No special pretreatment is necessary, and the technique results in a rapid, conformal amino acid coating that can be utilized for further biometallization.

  17. Luminescent Nanocrystalline Silicon Carbide Thin Film Deposited by Helicon Wave Plasma Enhanced Chemical Vapour Deposition

    Institute of Scientific and Technical Information of China (English)

    LU Wan-bing; YU Wei; WU Li-ping; CUI Shuang-kui; FU Guang-sheng

    2006-01-01

    Hydrogenated nanocrystalline silicon carbide (SiC) thin films were deposited on the single-crystal silicon substrate using the helicon wave plasma enhanced chemical vapor deposition (HW-PECVD) technique. The influences of magnetic field and hydrogen dilution ratio on the structures of SiC thin film were investigated with the atomic force microscopy (AFM), the Fourier transform infrared absorption (FTIR) and the transmission electron microscopy (TEM). The results indicate that the high plasma activity of the helicon wave mode proves to be a key factor to grow crystalline SiC thin films at a relative low substrate temperature. Also, the decrease in the grain sizes from the level of microcrystalline to that of nanocrystalline can be achieved by increasing the hydrogen dilution ratios. Transmission electron microscopy measurements reveal that the size of most nanocrystals in the film deposited under the higher hydrogen dilution ratios is smaller than the doubled Bohr radius of 3C-SiC (approximately 5.4 nm), and the light emission measurements also show a strong blue photoluminescence at the room temperature, which is considered to be caused by the quantum confinement effect of small-sized SiC nanocrystals.

  18. Vitamin C Pretreatment Enhances the Antibacterial Effect of Cold Atmospheric Plasma

    Science.gov (United States)

    Helgadóttir, Saga; Pandit, Santosh; Mokkapati, Venkata R. S. S.; Westerlund, Fredrik; Apell, Peter; Mijakovic, Ivan

    2017-01-01

    Bacterial biofilms are three-dimensional structures containing bacterial cells enveloped in a protective polymeric matrix, which renders them highly resistant to antibiotics and the human immune system. Therefore, the capacity to make biofilms is considered as a major virulence factor for pathogenic bacteria. Cold Atmospheric Plasma (CAP) is known to be quite efficient in eradicating planktonic bacteria, but its effectiveness against biofilms has not been thoroughly investigated. The goal of this study was to evaluate the effect of exposure of CAP against mature biofilm for different time intervals and to evaluate the effect of combined treatment with vitamin C. We demonstrate that CAP is not very effective against 48 h mature bacterial biofilms of several common opportunistic pathogens: Staphylococcus epidermidis, Escherichia coli, and Pseudomonas aeruginosa. However, if bacterial biofilms are pre-treated with vitamin C for 15 min before exposure to CAP, a significantly stronger bactericidal effect can be obtained. Vitamin C pretreatment enhances the bactericidal effect of cold plasma by reducing the viability from 10 to 2% in E. coli biofilm, 50 to 11% in P. aeruginosa, and 61 to 18% in S. epidermidis biofilm. Since it is not feasible to use extended CAP treatments in medical practice, we argue that the pre-treatment of infectious lesions with vitamin C prior to CAP exposure can be a viable route for efficient eradication of bacterial biofilms in many different applications. PMID:28275584

  19. Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor.

    Science.gov (United States)

    Park, Jae-Min; Jang, Se Jin; Yusup, Luchana L; Lee, Won-Jun; Lee, Sang-Ick

    2016-08-17

    We report the plasma-enhanced atomic layer deposition (PEALD) of silicon nitride thin film using a silylamine compound as the silicon precursor. A series of silylamine compounds were designed by replacing SiH3 groups in trisilylamine by dimethylaminomethylsilyl or trimethylsilyl groups to obtain sufficient thermal stability. The silylamine compounds were synthesized through redistribution, amino-substitution, lithiation, and silylation reactions. Among them, bis(dimethylaminomethylsilyl)trimethylsilyl amine (C9H29N3Si3, DTDN2-H2) was selected as the silicon precursor because of the lowest bond dissociation energy and sufficient vapor pressures. The energies for adsorption and reaction of DTDN2-H2 with the silicon nitride surface were also calculated by density functional theory. PEALD silicon nitride thin films were prepared using DTDN2-H2 and N2 plasma. The PEALD process window was between 250 and 400 °C with a growth rate of 0.36 Å/cycle. The best film quality was obtained at 400 °C with a RF power of 100 W. The PEALD film prepared showed good bottom and sidewall coverages of ∼80% and ∼73%, respectively, on a trench-patterned wafer with an aspect ratio of 5.5.

  20. The physical properties of cubic plasma-enhanced atomic layer deposition TaN films

    Science.gov (United States)

    Kim, H.; Lavoie, C.; Copel, M.; Narayanan, V.; Park, D.-G.; Rossnagel, S. M.

    2004-05-01

    Plasma-enhanced atomic layer deposition (PE-ALD) is a promising technique to produce high quality metal and nitride thin films at low growth temperature. In this study, very thin (<10 nm) low resistivity (350 μΩ cm) cubic TaN Cu diffusion barrier were deposited by PE-ALD from TaCl5 and a plasma of both hydrogen and nitrogen. The physical properties of TaN thin films including microstructure, conformality, roughness, and thermal stability were investigated by various analytical techniques including x-ray diffraction, medium energy ion scattering, and transmission electron microscopy. The Cu diffusion barrier properties of PE-ALD TaN thin films were studied using synchrotron x-ray diffraction, optical scattering, and sheet resistance measurements during thermal annealing of the test structures. The barrier failure temperatures were obtained as a function of film thickness and compared with those of PE-ALD Ta, physical vapor deposition (PVD) Ta, and PVD TaN. A diffusion kinetics analysis showed that the microstructure of the barrier materials is one of the most critical factors for Cu diffusion barrier performance.

  1. Enhancement of the maximum proton energy by funnel-geometry target in laser-plasma interactions

    Science.gov (United States)

    Yang, Peng; Fan, Dapeng; Li, Yuxiao

    2016-09-01

    Enhancement of the maximum proton energy using a funnel-geometry target is demonstrated through particle simulations of laser-plasma interactions. When an intense short-pulse laser illuminate a thin foil target, the foil electrons are pushed by the laser ponderomotive force, and then form an electron cloud at the target rear surface. The electron cloud generates a strong electrostatic field, which accelerates the protons to high energies. If there is a hole in the rear of target, the shape of the electron cloud and the distribution of the protons will be affected by the protuberant part of the hole. In this paper, a funnel-geometry target is proposed to improve the maximum proton energy. Using particle-in-cell 2-dimensional simulations, the transverse electric field generated by the side wall of four different holes are calculated, and protons inside holes are restricted to specific shapes by these field. In the funnel-geometry target, more protons are restricted near the center of the longitudinal accelerating electric field, thus protons experiencing longer accelerating time and distance in the sheath field compared with that in a traditional cylinder hole target. Accordingly, more and higher energy protons are produced from the funnel-geometry target. The maximum proton energy is improved by about 4 MeV compared with a traditional cylinder-shaped hole target. The funnel-geometry target serves as a new method to improve the maximum proton energy in laser-plasma interactions.

  2. Research of the Effects of Electron Focused Electric Field upon an Enhanced Glow Discharge Plasma Ion Implantation

    Institute of Scientific and Technical Information of China (English)

    LI Liu-he; WU Yong-qin; ZHANG Yan-hua; CAI Xun; CHU Paul K

    2004-01-01

    A new Enhanced Glow Discharge Plasma Ion Implantation methods are introduced, in which the plasma are produced by the self glow discharge excitated by high negative voltage bias. The electric field is designed to a electron focusing mode by using a small area hollow anode and a large area sample holder cathode. The pattern of equipotentials of the electric field are calculated through finite-element method. By using the special electron-focusing field, the self glow discharge are enhanced and provide denser ions to implanted into the substrate.

  3. Enhanced human bone marrow mesenchymal stem cell functions on cathodic arc plasma-treated titanium

    Directory of Open Access Journals (Sweden)

    Zhu W

    2015-12-01

    Full Text Available Wei Zhu,1 George Teel,1 Christopher M O’Brien,1 Taisen Zhuang,1 Michael Keidar,1 Lijie Grace Zhang1–3 1Department of Mechanical and Aerospace Engineering, 2Department of Biomedical Engineering, 3Department of Medicine, The George Washington University, Washington, DC, USA Abstract: Surface modification of titanium for use in orthopedics has been explored for years; however, an ideal method of integrating titanium with native bone is still required to this day. Since human bone cells directly interact with nanostructured extracellular matrices, one of the most promising methods of improving titanium’s osseointegration involves inducing biomimetic nanotopography to enhance cell–implant interaction. In this regard, we explored an approach to functionalize the surface of titanium by depositing a thin film of textured titanium nanoparticles via a cathodic arc discharge plasma. The aim is to improve human bone marrow mesenchymal stem cell (MSC attachment and differentiation and to reduce deleterious effects of more complex surface modification methods. Surface functionalization was analyzed by scanning electron microscopy, atomic force microscopy, contact angle testing, and specific protein adsorption. Scanning electron microscopy and atomic force microscopy examination demonstrate the deposition of titanium nanoparticles and the surface roughness change after coating. The specific fibronectin adsorption was enhanced on the modified titanium surface that associates with the improved hydrophilicity. MSC adhesion and proliferation were significantly promoted on the nanocoated surface. More importantly, compared to bare titanium, greater production of total protein, deposition of calcium mineral, and synthesis of alkaline phosphatase were observed from MSCs on nanocoated titanium after 21 days. The method described herein presents a promising alternative method for inducing more cell favorable nanosurface for improved orthopedic applications

  4. Raman modes in transferred bilayer CVD graphene

    Directory of Open Access Journals (Sweden)

    Niilisk Ahti

    2015-01-01

    Full Text Available A systematic experimental Raman spectroscopic study of twisted bilayer graphene (tBLG domains localized inside wide-area single layer graphene (SLG produced by low-pressure CVD on Cu foil and transferred onto SiO2/Si substrate has been performed. According to the Raman characterization the tBLG domains had a great variety of twisting angles θ between the bottom and top graphene layers (6° < θ < 25°. The twisting angle θ was estimated from the spectral position of the rotating R and R' modes in the Raman spectrum.Under G band resonance conditions the breathing mode ZO' with a frequency of 95- 97 cm−1 was detected, and a breathing mode ZO was found in the spectra between 804 cm−1 and 836 cm−1, its position depending on the twisting angle θ. An almost linear relationship was found between the frequencies ωZO and ωR. Also a few other spectral peculiarities were found, e.g. a high-energy excitation of the G band resonance, the 2G overtone appearing at 3170-3180 cm−1 by the G band resonance, revealing a linear dispersion of 80 cm−1/eV of the 2D band in tBLG

  5. An assessment of radiotherapy dosimeters based on CVD grown diamond

    CERN Document Server

    Ramkumar, S; Conway, J; Whitehead, A J; Sussman, R S; Hill, G; Walker, S

    2001-01-01

    Diamond is potentially a very suitable material for use as a dosimeter for radiotherapy. Its radiation hardness, the near tissue equivalence and chemical inertness are some of the characteristics of diamond, which make it well suited for its application as a dosimeter. Recent advances in the synthesis of diamond by chemical vapour deposition (CVD) technology have resulted in the improvement in the quality of material and increased its suitability for radiotherapy applications. We report in this paper, the response of prototype dosimeters based on two different types (CVD1 and CVD2) of CVD diamond to X-rays. The diamond devices were assessed for sensitivity, dependence of response on dose and dose rate, and compared with a Scanditronix silicon photon diode and a PTW natural diamond dosimeter. The diamond devices of CVD1 type showed an initial increase in response with dose, which saturates after approx 6 Gy. The diamond devices of CVD2 type had a response at low fields (1162.8 V/cm), the CVD2-type devices show...

  6. Grb10 deletion enhances muscle cell proliferation, differentiation and GLUT4 plasma membrane translocation.

    Science.gov (United States)

    Mokbel, Nancy; Hoffman, Nolan J; Girgis, Christian M; Small, Lewin; Turner, Nigel; Daly, Roger J; Cooney, Gregory J; Holt, Lowenna J

    2014-11-01

    Grb10 is an intracellular adaptor protein which binds directly to several growth factor receptors, including those for insulin and insulin-like growth factor receptor-1 (IGF-1), and negatively regulates their actions. Grb10-ablated (Grb10(-/-) ) mice exhibit improved whole body glucose homeostasis and an increase in muscle mass associated specifically with an increase in myofiber number. This suggests that Grb10 may act as a negative regulator of myogenesis. In this study, we investigated in vitro, the molecular mechanisms underlying the increase in muscle mass and the improved glucose metabolism. Primary muscle cells isolated from Grb10(-/-) mice exhibited increased rates of proliferation and differentiation compared to primary cells isolated from wild-type mice. The improved proliferation capacity was associated with an enhanced phosphorylation of Akt and ERK in the basal state and changes in the expression of key cell cycle progression markers involved in regulating transition of cells from the G1 to S phase (e.g., retinoblastoma (Rb) and p21). The absence of Grb10 also promoted a faster transition to a myogenin positive, differentiated state. Glucose uptake was higher in Grb10(-/-) primary myotubes in the basal state and was associated with enhanced insulin signaling and an increase in GLUT4 translocation to the plasma membrane. These data demonstrate an important role for Grb10 as a link between muscle growth and metabolism with therapeutic implications for diseases, such as muscle wasting and type 2 diabetes.

  7. Enhanced human bone marrow mesenchymal stem cell functions on cathodic arc plasma-treated titanium.

    Science.gov (United States)

    Zhu, Wei; Teel, George; O'Brien, Christopher M; Zhuang, Taisen; Keidar, Michael; Zhang, Lijie Grace

    2015-01-01

    Surface modification of titanium for use in orthopedics has been explored for years; however, an ideal method of integrating titanium with native bone is still required to this day. Since human bone cells directly interact with nanostructured extracellular matrices, one of the most promising methods of improving titanium's osseointegration involves inducing bio-mimetic nanotopography to enhance cell-implant interaction. In this regard, we explored an approach to functionalize the surface of titanium by depositing a thin film of textured titanium nanoparticles via a cathodic arc discharge plasma. The aim is to improve human bone marrow mesenchymal stem cell (MSC) attachment and differentiation and to reduce deleterious effects of more complex surface modification methods. Surface functionalization was analyzed by scanning electron microscopy, atomic force microscopy, contact angle testing, and specific protein adsorption. Scanning electron microscopy and atomic force microscopy examination demonstrate the deposition of titanium nanoparticles and the surface roughness change after coating. The specific fibronectin adsorption was enhanced on the modified titanium surface that associates with the improved hydrophilicity. MSC adhesion and proliferation were significantly promoted on the nanocoated surface. More importantly, compared to bare titanium, greater production of total protein, deposition of calcium mineral, and synthesis of alkaline phosphatase were observed from MSCs on nanocoated titanium after 21 days. The method described herein presents a promising alternative method for inducing more cell favorable nanosurface for improved orthopedic applications.

  8. Bilayer Suspension Plasma-Sprayed Thermal Barrier Coatings with Enhanced Thermal Cyclic Lifetime: Experiments and Modeling

    Science.gov (United States)

    Gupta, Mohit; Kumara, Chamara; Nylén, Per

    2017-08-01

    Suspension plasma spraying (SPS) has been shown as a promising process to produce porous columnar strain tolerant coatings for thermal barrier coatings (TBCs) in gas turbine engines. However, the highly porous structure is vulnerable to crack propagation, especially near the topcoat-bondcoat interface where high stresses are generated due to thermal cycling. A topcoat layer with high toughness near the topcoat-bondcoat interface could be beneficial to enhance thermal cyclic lifetime of SPS TBCs. In this work, a bilayer coating system consisting of first a dense layer near the topcoat-bondcoat interface followed by a porous columnar layer was fabricated by SPS using Yttria-stabilised zirconia suspension. The objective of this work was to investigate if the bilayer topcoat architecture could enhance the thermal cyclic lifetime of SPS TBCs through experiments and to understand the effect of the column gaps/vertical cracks and the dense layer on the generated stresses in the TBC during thermal cyclic loading through finite element modeling. The experimental results show that the bilayer TBC had significantly higher lifetime than the single-layer TBC. The modeling results show that the dense layer and vertical cracks are beneficial as they reduce the thermally induced stresses which thus increase the lifetime.

  9. Polyethylene Oxide Films Polymerized by Radio Frequency Plasma-Enhanced Chemical Vapour Phase Deposition and Its Adsorption Behaviour of Platelet-Rich Plasma

    Science.gov (United States)

    Hu, Wen-Juan; Xie, Fen-Yan; Chen, Qiang; Weng, Jing

    2008-10-01

    We present polyethylene oxide (PEO) functional films polymerized by rf plasma-enhanced vapour chemical deposition (rf-PECVD) on p-Si (100) surface with precursor ethylene glycol dimethyl ether (EGDME) and diluted Ar in pulsed plasma mode. The influences of discharge parameters on the film properties and compounds are investigated. The film structure is analysed by Fourier transform infrared (FTIR) spectroscopy. The water contact angle measurement and atomic force microscope (AFM) are employed to examine the surface polarity and to detect surface morphology, respectively. It is concluded that the smaller duty cycle in pulsed plasma mode contributes to the rich C-O-C (EO) group on the surfaces. As an application, the adsorption behaviour of platelet-rich plasma on plasma polymerization films performed in-vitro is explored. The shapes of attached cells are studied in detail by an optic invert microscope, which clarifies that high-density C-O-C groups on surfaces are responsible for non-fouling adsorption behaviour of the PEO films.

  10. Polyethylene Oxide Films Polymerized by Radio Frequency Plasma-Enhanced Chemical Vapour Phase Deposition and Its Adsorption Behaviour of Platelet-Rich Plasma

    Institute of Scientific and Technical Information of China (English)

    HU Wen-Juan; XIE Fen-Yan; CHEN Qiang; WENG Jing

    2008-01-01

    We present polyethylene oxide (PEO) functional films polymerized by rf plasma-enhanced vapour chemical deposition (rf-PECVD) on p-Si (100) surface with precursor ethylene glycol dimethyl ether (EGDME) and diluted Ar in pulsed plasma mode. The influences of discharge parameters on the film properties and compounds are investigated. The film structure is analysed by Fourier transform infrared (FTIR) spectroscopy. The water contact angle measurement and atomic force microscope (AFM) are employed to examine the surface polarity and to detect surface morphology, respectively. It is concluded that the smaller duty cycle in pulsed plasma mode contributes to the rich C-O-C (EO) group on the surfaces. As an application, the adsorption behaviour of platelet-rich plasma on plasma polymerization films performed in-vitro is explored. The shapes of attached cells are studied in detail by an optic invert microscope, which clarifies that high-density C-O-C groups on surfaces are responsible for non-fouling adsorption behaviour of the PEO films.

  11. Mechanics-driven patterning of CVD graphene for roll-based manufacturing process

    Science.gov (United States)

    Kim, Sang-Min; Jang, Bongkyun; Jo, Kyungmin; Kim, Donghyuk; Lee, Jihye; Kim, Kyung-Shik; Lee, Seung-Mo; Lee, Hak-Joo; Han, Seung Min; Kim, Jae-Hyun

    2017-06-01

    Graphene is considered as a promising material for flexible and transparent electrodes due to its outstanding electrical, optical, and mechanical properties. Efforts to mass-produce graphene electrodes led to the development of roll-to-roll chemical vapor deposition (CVD) graphene growth and transfer, and the only remaining obstacle to the mass-production of CVD graphene electrodes is a cost-effective patterning technique that is compatible with the roll-to-roll manufacturing. Herein, we propose a mechanics-driven technique for patterning graphene synthesized on copper foil (commonly used in roll-to-roll manufacturing). The copper foil is exposed to high temperature for a prolonged period during the CVD growth of graphene, and thus can result in recrystallization and grain growth of the copper foil and thereby reducing to the yield strength. This softening behavior of the copper was carefully controlled to allow simple stamp patterning of the graphene. The strength of the underlying substrate was controlled for the accuracy of the residual patterns. The proposed stamp patterning technique is mask-less and photoresist-free, and can be performed at room temperature without high-energy sources such as lasers or plasma. To demonstrate the capability of this process to produce a continuous electrode, a transparent in-plane supercapacitor was fabricated using the proposed patterning technique.

  12. Effects of Postoperative Enteral Immune-enhancing Diet on Plasma Endotoxin Level, Plasma Endotoxin Inactivation Capacity and Clinical Outcome

    Institute of Scientific and Technical Information of China (English)

    YAO Guoxiang; XUE Xinbo; LU Xingpei; WANG Jianming; QIAN Jiaqin

    2005-01-01

    This study examined the postoperative plasma endotoxin level, plasma endotoxin inactivation capacity and clinical outcome after administration of an enteral diet supplemented with glutamine, arginine and ω-3-fatty acid in patients undergoing gastrointestinal operations on an prospective, randomized and double-blind design. 40 patients undergoing gastrointestinal operations were randomized into two groups, with each having 20 patients. One group received standard enteral nutrition and the other was fed the formulation supplemented with glutamine, arginine and ω-3-fatty acid. The two groups were isonitrogenous. The infusion was started from day 1 after surgery and continued for 7 days. Blood samples were collected on the morning of day 1 before operation and on the morning of 1, 4 and 7 day(s) after operation and analyzed for plasma endotoxin level and endotoxin inactivation capacity (EIC). Our study found no differences between the two groups on plasma endotoxin level. After surgery a rapid reduction in plasma endotoxin inactivation capacity was observed in both groups, a significant recovery of the plasma endotoxin inactivation capacity was observed on morning of day 4 after surgery in the study group (0.12±0.02 EU/mL and 0. 078±0.022 EU/mL respectively, P<0.01). Shortened hospital stay was observed in the experimental group (11.7±2.0 days in the control group and 10.6±1.2 days in the experimental group respectively, P=0.03). It is concluded that perioperative parenteral nutrition supplemented with glutamine, arginine and ω-3-fatty acid ameliorated postoperative immunodepression but without direct effect on endotoxemia.

  13. Plasma-enhanced chemical vapor deposited silicon oxynitride films for optical waveguide bridges for use in mechanical sensors

    DEFF Research Database (Denmark)

    Storgaard-Larsen, Torben; Leistiko, Otto

    1997-01-01

    In this paper the influence of RF power, ammonia flow, annealing temperature, and annealing time on the optical and mechanical properties of plasma-enhanced chemically vapor deposited silicon oxynitride films, is presented. A low refractive index (1.47 to 1.48) film having tensile stress has been...

  14. Lowering plasma frequency by enhancing the effective mass of electrons: A route to deep sub-wavelength metamaterials

    Institute of Scientific and Technical Information of China (English)

    Qin Gang; Wang Jia-Fu; Yan Ming-Bao; Chen Wei; Chen Hong-Ya; Li Yong-Feng

    2013-01-01

    Deep sub-wavelength metamaterials are the key to the further development of practical metamaterials with small volumes and broadband properties.We propose to reduce the electrical sizes of metamaterials down to more sub-wavelength scales by lowering the plasma frequencies of metallic wires.The theoretical model is firstly established by analyzing the plasma frequency of continuous thin wires.By introducing more inductance elements,the effective electron mass can be enhanced drastically,leading to significantly lowered plasma frequencies.Based on this theory,we demonstrate that both the electric and the magnetic plasma frequencies of metamaterials can be lowered significantly and thus the electrical sizes of metamaterials can be reduced to more sub-wavelength scales.This provides an efficient route to deep sub-wavelength metamaterials and will give rigorous impetus for the further development of practical metamaterials.

  15. Detection of HO2 in an atmospheric pressure plasma jet using optical feedback cavity-enhanced absorption spectroscopy

    Science.gov (United States)

    Gianella, Michele; Reuter, Stephan; Lawry Aguila, Ana; Ritchie, Grant A. D.; van Helden, Jean-Pierre H.

    2016-11-01

    Cold non-equilibrium atmospheric pressure plasma jets are increasingly applied in material processing and plasma medicine. However, their small dimensions make diagnosing the fluxes of generated species a challenge. Here we report on the detection of the hydroperoxyl radical, HO2, in the effluent of a plasma jet by the use of optical feedback cavity-enhanced absorption spectroscopy. The spectrometer has a minimum detectable absorption coefficient {α }\\min of 2.25× {10}-10 cm-1 with a 100 second acquisition, equivalent to 5.5× {10}12 {{cm}}-3 of HO2 (under ideal conditions). Concentrations in the range of (3.1-7.8) × 1013 cm-3 were inferred in the 4 mm wide effluent of the plasma jet.

  16. Plasma-Enhanced Atomic Layer Deposition (PEALD of TiN using the Organic Precursor Tetrakis(ethylmethylamidoTitanium (TEMAT

    Directory of Open Access Journals (Sweden)

    Chen Z.X.

    2016-01-01

    Full Text Available This paper presents the plasma-enhanced atomic layer deposition (PEALD of titanium nitride (TiN using the organic precursor tetrakis(ethylmethylamidotitanium (TEMAT, with remote ammonia (NH3 plasma as reactant gas. This work investigates the impact of substrate temperature, from 150-350°C, and plasma times, from 5-30s, on deposition rate, resistivity, carbon content, N/Ti ratio and film density. The lowest resistivity of ~ 250 μΩ.cm was achieved at substrate temperatures 300-350°C and plasma time of 20s. At low substrate temperatures, although deposition was possible, carbon concentration was found to be higher, which thus affects film resistivity and density.

  17. Fabrication of Titanium Dioxide Thin Films by DBD-CVD Under Atmosphere

    Institute of Scientific and Technical Information of China (English)

    ZHANG Xi-wen; GUO Yu; HAN Gao-rong

    2007-01-01

    Titanium dioxide films were firstly deposited on glass substrate by DBD-CVD (dielectric barrier discharge enhanced chemical vapor deposition) technique.The structure of the films was investigated by X-ray diffraction (XRD),scanning electron microscopy (SEM).TiO2 films deposited under atmosphere pressure show preferred orientation,and exhibit columnar-like structure,while TiO2 films deposited under low gas pressure show no preferred orientation.The columnar-like structure with preferred orientation exhibits higher photocatalytic efficiency,since the columnar structure has larger surface area.However,it contributes little to the improvement of hydrophilicity. DBD-CVD is an alternative method to prepare photocatalytic TiO2 for its well-controllable property.

  18. A Study on Fretting Wear Property of CVD SiC and Sintered SiC

    Energy Technology Data Exchange (ETDEWEB)

    Cha, Hyun-Jin; Jang, Ki-Nam; An, Ji-Hyeong; Kim, Kyu-Tae [Dongguk University, Gyeongju (Korea, Republic of)

    2015-10-15

    Silicon Carbide is broadly used as high temperature structure material because of its high temperature tolerance and superior mechanical properties. After the Fukushima nuclear power plant accident, SiC proposed as one of the alternative materials for LWR fuel cladding to provide enhanced safety margin. Grid-to-rod fretting wear-induced fuel failure is known to occur due to flow-induced vibration of the reactor core and grid to- rod gap. In this paper, wear tests for CVD SiC plate and sintered SiC tube were performed with two types of spacer grids. Wear test of corroded and non-corroded CVD SiC plates indicate that wear resistance of corroded specimen is lower than one of non-corroded specimen in contrast with zirconium alloy cladding tube. It may be affected by rough surface of corroded specimen caused by grain boundary attack.

  19. Enhancing Plasma Surface Modification using high Intensity and high Power Ultrasonic Acoustic Waves

    DEFF Research Database (Denmark)

    2010-01-01

    This invention relates to a plasma surface modification process (and a corresponding a system) of a solid object (100) comprising creating plasma (104) by a plasma source (106), application of the plasma (104) to at least a part of a surface (314) of the solid object (100), generating ultrasonic...... or a mixture of gases (500) flow in contact with said solid object (100) is thinned or destructed for at least a part of said surface (314). In this way, the plasma can more efficiently access and influence the surface of the solid object to be treated by the plasma, which speeds the process time up...

  20. Contact resistance study of various metal electrodes with CVD graphene

    Science.gov (United States)

    Gahoi, Amit; Wagner, Stefan; Bablich, Andreas; Kataria, Satender; Passi, Vikram; Lemme, Max C.

    2016-11-01

    In this study, the contact resistance of various metals to chemical vapor deposited (CVD) monolayer graphene is investigated. Transfer length method (TLM) structures with varying channel widths and separation between contacts have been fabricated and electrically characterized in ambient air and vacuum condition. Electrical contacts are made with five metals: gold, nickel, nickel/gold, palladium and platinum/gold. The lowest value of 92 Ω μm is observed for the contact resistance between graphene and gold, extracted from back-gated devices at an applied back-gate bias of -40 V. Measurements carried out under vacuum show larger contact resistance values when compared with measurements carried out in ambient conditions. Post processing annealing at 450 °C for 1 h in argon-95%/hydrogen-5% atmosphere results in lowering the contact resistance value which is attributed to the enhancement of the adhesion between metal and graphene. The results presented in this work provide an overview for potential contact engineering for high performance graphene-based electronic devices.

  1. New Spectrofluorimetric Method with Enhanced Sensitivity for Determination of Paroxetine in Dosage Forms and Plasma

    Directory of Open Access Journals (Sweden)

    Ibrahim A. Darwish

    2008-01-01

    Full Text Available New simple spectrofluorimetric method with enhanced sensitivity has been developed and validated for the determination of the antidepressant paroxetine (PXT in its dosage forms and plasma. The method was based on nucleophilic substitution reaction of PXT with 4-chloro-7-nitrobenzo-2-oxa-1,3-diazole in an alkaline medium (pH 8 to form a highly fluorescent derivative that was measured at 545 nm after excitation at 490 nm. The factors affecting the reaction was carefully studied and optimized. The kinetics of the reaction was investigated, and the reaction mechanism was presented. Under the optimized conditions, linear relationship with good correlation coefficient (0.9993 was found between the fluorescence intensity and PXT concentration in the range of 80–800 ng ml−1. The limits of detection and quantitation for the method were 25 and 77 ng ml−1, respectively. The precision of the method was satisfactory; the values of relative standard deviations did not exceed 3%. The proposed method was successfully applied to the determination of PXT in its pharmaceutical tablets with good accuracy; the recovery values were 100.2 ± 1.61%. The results obtained by the proposed method were comparable with those obtained by the official method. The proposed method is superior to the previously reported spectrofluorimetric method for determination of PXT in terms of its higher sensitivity and wider linear range. The high sensitivity of the method allowed its successful application to the analysis of PXT in spiked human plasma. The proposed method is practical and valuable for its routine application in quality control and clinical laboratories for analysis of PXT.

  2. Properties of HfAlO film deposited by plasma enhanced atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Cao, Duo [State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050 (China); Cheng, Xinhong, E-mail: xh_cheng@mail.sim.ac.cn [State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050 (China); Jia, Tingting; Zheng, Li; Xu, Dawei; Wang, Zhongjian; Xia, Chao; Yu, Yuehui [State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050 (China)

    2013-07-15

    Plasma enhanced atomic layer deposition (PEALD) method can reduce film growing temperature, and allow in situ plasma treatment. In this work, HfAlO and HfO{sub 2} films were deposited with PEALD at 160 °C. Microstructure analysis showed that both films were amorphous after rapid thermal annealing (RTA) treatment, and HfAlO sample showed better interfacial structure than HfO{sub 2}. X-ray photoelectron spectroscopy (XPS) spectra indicated that main component of the interfacial layer of HfAlO sample was Hf–Si–O and Al–Si–O bonds, the valence band offset value between the HfAlO film and Si substrate was calculated to be 2.5 eV. The dominant leakage current mechanism of the samples was Schottky emission at a low electric field (<1.4 MV/cm), and Poole–Frenkel emission mechanism at a higher electric field (>1.4 MV/cm). The equivalent oxide thicknesses (EOT) of the HfAlO samples were 1.0 nm and 1.3 nm, respectively. The density of interface states between dielectric and substrate were calculated to be 1.2 × 10{sup 12} eV{sup −1}cm{sup −2} and 1.3 × 10{sup 12} eV{sup −1}cm{sup −2}, respectively. In comparison with HfO{sub 2} film, HfAlO film has good interfacial structure and electrical performance.

  3. Ag films grown by remote plasma enhanced atomic layer deposition on different substrates

    Energy Technology Data Exchange (ETDEWEB)

    Amusan, Akinwumi A., E-mail: akinwumi.amusan@ovgu.de; Kalkofen, Bodo; Burte, Edmund P. [Institute of Micro and Sensor Systems, Otto-von-Guericke University, Universitätsplatz 2, 39106 Magdeburg (Germany); Gargouri, Hassan; Wandel, Klaus; Pinnow, Cay [SENTECH Instruments GmbH, Schwarzschildstraße 2, 12489 Berlin (Germany); Lisker, Marco [IHP, Im Technologiepark 25, 15236 Frankfurt (Oder) (Germany)

    2016-01-15

    Silver (Ag) layers were deposited by remote plasma enhanced atomic layer deposition (PALD) using Ag(fod)(PEt{sub 3}) (fod = 2,2-dimethyl-6,6,7,7,8,8,8-heptafluorooctane-3,5-dionato) as precursor and hydrogen plasma on silicon substrate covered with thin films of SiO{sub 2}, TiN, Ti/TiN, Co, Ni, and W at different deposition temperatures from 70  to 200 °C. The deposited silver films were analyzed by x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), scanning electron microscopy (SEM), transmission electron microscopy (TEM) with energy dispersive x-ray spectroscopy, four point probe measurement, ellipsometric measurement, x-ray fluorescence (XRF), and x-ray diffraction (XRD). XPS revealed pure Ag with carbon and oxygen contamination close to the detection limit after 30 s argon sputtering for depositions made at 120 and 200 °C substrate temperatures. However, an oxygen contamination was detected in the Ag film deposited at 70 °C after 12 s argon sputtering. A resistivity of 5.7 × 10{sup −6} Ω cm was obtained for approximately 97 nm Ag film on SiO{sub 2}/Si substrate. The thickness was determined from the SEM cross section on the SiO{sub 2}/Si substrate and also compared with XRF measurements. Polycrystalline cubic Ag reflections were identified from XRD for PALD Ag films deposited at 120 and 200 °C. Compared to W surface, where poor adhesion of the films was found, Co, Ni, TiN, Ti/TiN and SiO{sub 2} surfaces had better adhesion for silver films as revealed by SEM, TEM, and AFM images.

  4. Plasma harmonics

    CERN Document Server

    Ganeev, Rashid A

    2014-01-01

    Preface; Why plasma harmonics? A very brief introduction Early stage of plasma harmonic studies - hopes and frustrations New developments in plasma harmonics studies: first successes Improvements of plasma harmonics; Theoretical basics of plasma harmonics; Basics of HHG Harmonic generation in fullerenes using few-cycle pulsesVarious approaches for description of observed peculiarities of resonant enhancement of a single harmonic in laser plasmaTwo-colour pump resonance-induced enhancement of odd and even harmonics from a tin plasmaCalculations of single harmonic generation from Mn plasma;Low-o

  5. The effectiveness of Ti implants as barriers to carbon diffusion in Ti implanted steel under CVD diamond deposition conditions

    Energy Technology Data Exchange (ETDEWEB)

    Weiser, P.S.; Prawer, S. [Melbourne Univ., Parkville, VIC (Australia). School of Physics; Hoffman, A. [Technion-Israel Inst. of Tech., Haifa (Israel). Dept. of Chemistry; Evan, P.J. [Australian Nuclear Science and Technology Organisation, Lucas Heights, NSW (Australia); Paterson, P.J.K. [Royal Melbourne Inst. of Tech., VIC (Australia)

    1993-12-31

    The growth of chemical vapour deposited (CVD) diamond onto iron based substrates complicated by preferential soot formation and carbon diffusion into the substrate [1], leading to poor quality films and poor adhesion. In the initial stages of exposure to a microwave plasma, a layer of graphite is rapidly formed on an untreated Fe based substrate. Once this graphite layer reaches a certain thickness, reasonable quality diamond nucleates and grows upon it. However, the diamond film easily delaminates from the substrate, the weak link being the graphitic layer. Following an initial success in using a TiN barrier layer to inhibit the formation of such a graphitic layer the authors report on attempts to use an implanted Ti layer for the same purpose. This work was prompted by observation that, although the TiN proved to be an extremely effective diffusion barrier, adhesion may be further enhanced by the formation of a TiC interface layer between the diamond film and the Fe substrate. 3 refs., 6 figs.

  6. A comparative study of nitrogen plasma effect on field emission characteristics of single wall carbon nanotubes synthesized by plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Kumar, Avshish; Parveen, Shama; Husain, Samina; Ali, Javid; Zulfequar, Mohammad; Harsh; Husain, Mushahid

    2014-12-01

    Vertically aligned single wall carbon nanotubes (SWCNTs) with large scale control of diameter, length and alignment have successfully been grown by plasma enhanced chemical vapor deposition (PECVD) system. The nickel (Ni) as catalyst deposited on silicon (Si) substrate was used to grow the SWCNTs. Field emission (FE) characteristics of the as grown SWCNTs were measured using indigenously designed setup in which a diode is configured in such a way that by applying negative voltage on the copper plate (cathode) with respect to stainless steel anode plate, current density can be recorded. To measure the FE characteristics, SWCNTs film pasted on the copper plate with silver epoxy was used as electron emitter source. The effective area of anode was ∼78.5 mm2 for field emission measurements. The emission measurements were carried out under high vacuum pressure of the order of 10-6 Torr to minimize the electron scattering and degradation of the emitters. The distance between anode and cathode was kept 500 μm (constant) during entire field emission studies. The grown SWCNTs are excellent field emitters, having emission current density higher than 25 mA/cm2 at turn-on field 1.3 V/μm. In order to enhance the field emission characteristics, the as grown SWCNTs have been treated under nitrogen (N2) plasma for 5 min and again field emission characteristics have been measured. The N2 plasma treated SWCNTs show a good enhancement in the field emission properties with emission current density 81.5 mA/cm2 at turn on field 1.2 V/μm. The as-grown and N2 plasma treated SWCNTs were also characterized by field emission scanning electron microscope (FESEM), high resolution transmission electron microscope (HRTEM), Raman spectrometer, Fourier transform infrared spectrometer (FTIR) and X-ray photoelectron spectroscopy (XPS).

  7. A solid-state nuclear magnetic resonance study of post-plasma reactions in organosilicone microwave plasma-enhanced chemical vapor deposition (PECVD) coatings.

    Science.gov (United States)

    Hall, Colin J; Ponnusamy, Thirunavukkarasu; Murphy, Peter J; Lindberg, Mats; Antzutkin, Oleg N; Griesser, Hans J

    2014-06-11

    Plasma-polymerized organosilicone coatings can be used to impart abrasion resistance and barrier properties to plastic substrates such as polycarbonate. Coating rates suitable for industrial-scale deposition, up to 100 nm/s, can be achieved through the use of microwave plasma-enhanced chemical vapor deposition (PECVD), with optimal process vapors such as tetramethyldisiloxane (TMDSO) and oxygen. However, it has been found that under certain deposition conditions, such coatings are subject to post-plasma changes; crazing or cracking can occur anytime from days to months after deposition. To understand the cause of the crazing and its dependence on processing plasma parameters, the effects of post-plasma reactions on the chemical bonding structure of coatings deposited with varying TMDSO-to-O2 ratios was studied with (29)Si and (13)C solid-state magic angle spinning nuclear magnetic resonance (MAS NMR) using both single-pulse and cross-polarization techniques. The coatings showed complex chemical compositions significantly altered from the parent monomer. (29)Si MAS NMR spectra revealed four main groups of resonance lines, which correspond to four siloxane moieties (i.e., mono (M), di (D), tri (T), and quaternary (Q)) and how they are bound to oxygen. Quantitative measurements showed that the ratio of TMDSO to oxygen could shift the chemical structure of the coating from 39% to 55% in Q-type bonds and from 28% to 16% for D-type bonds. Post-plasma reactions were found to produce changes in relative intensities of (29)Si resonance lines. The NMR data were complemented by Fourier transform infrared (FTIR) spectroscopy. Together, these techniques have shown that the bonding environment of Si is drastically altered by varying the TMDSO-to-O2 ratio during PECVD, and that post-plasma reactions increase the cross-link density of the silicon-oxygen network. It appears that Si-H and Si-OH chemical groups are the most susceptible to post-plasma reactions. Coatings produced at a

  8. Novel Gas Barrier SiOC Coating to PET Bottles through a Hot Wire CVD Method

    Directory of Open Access Journals (Sweden)

    Masaki Nakaya

    2016-01-01

    Full Text Available In an attempt to enhance the gas barrier enhancement of plastic containers such as poly(ethylene terephthalate bottles, a novel method was found using a hot wire CVD technique, where tantalum wire is heated and exposed to a gas flow of vinyl silane. The resultant SiOC thin film was confirmed to characteristically contain Si-Si bonds in its surface and demonstrate a remarkably and highly practical decrease of the permeation of various gas through poly(ethylene terephthalate bottles.

  9. CVD Diamond Sensors In Detectors For High Energy Physics

    CERN Document Server

    AUTHOR|(INSPIRE)INSPIRE-00334150; Trischuk, William

    At the end of the next decade an upgrade of the Large Hadron Collider (LHC) to High Luminosity LHC (HL-LHC) is planned which requires the development of new radiation tolerant sensor technology. Diamond is an interesting material for use as a particle detector in high radiation environments. The large band gap ($5.47\\,\\text{eV}$) and the large displacement energy suggest that diamond is a radiation tolerant detector material. In this Thesis the capability of Chemical Vapor Deposition (CVD) diamond as such a sensor technology is investigated. The radiation damage constant for $800\\,\\text{MeV}$ protons is measured using single crystalline CVD (scCVD) and polycrystalline CVD (pCVD) diamonds irradiated to particle fluences up to $12 \\times 10^{15}\\,\\text{p/cm}^2$. In addition the signal response of a pCVD diamond detector after an irradiation to $12 \\times 10^{15}\\,\\text{p/cm}^2$ is investigated to determine if such a detector can be operated efficiently in the expected HL-LHC environment. By using electrodes em...

  10. Supplementation with zinc in rats enhances memory and reverses an age-dependent increase in plasma copper.

    Science.gov (United States)

    Sandusky-Beltran, Leslie A; Manchester, Bryce L; McNay, Ewan C

    2017-08-30

    Zinc and copper are essential trace elements. Dyshomeostasis in these two metals has been observed in Alzheimer's disease, which causes profound cognitive impairment. Insulin therapy has been shown to enhance cognitive performance; however, recent data suggest that this effect may be at least in part due to the inclusion of zinc in the insulin formulation used. Zinc plays a key role in regulation of neuronal glutamate signaling, suggesting a possible link between zinc and memory processes. Consistent with this, zinc deficiency causes cognitive impairments in children. The effect of zinc supplementation on short- and long-term recognition memory, and on spatial working memory, was explored in young and adult male Sprague Dawley rats. After behavioral testing, hippocampal and plasma zinc and copper were measured. Age increased hippocampal zinc and copper, as well as plasma copper, and decreased plasma zinc. An interaction between age and treatment affecting plasma copper was also found, with zinc supplementation reversing elevated plasma copper concentration in adult rats. Zinc supplementation enhanced cognitive performance across tasks. These data support zinc as a plausible therapeutic intervention to ameliorate cognitive impairment in disorders characterized by alterations in zinc and copper, such as Alzheimer's disease. Copyright © 2017 Elsevier B.V. All rights reserved.

  11. Enhanced nonlinear iterative techniques applied to a non-equilibrium plasma flow

    Energy Technology Data Exchange (ETDEWEB)

    Knoll, D.A.; McHugh, P.R. [Idaho National Engineering Lab., Idaho Falls, ID (United States)

    1996-12-31

    We study the application of enhanced nonlinear iterative methods to the steady-state solution of a system of two-dimensional convection-diffusion-reaction partial differential equations that describe the partially-ionized plasma flow in the boundary layer of a tokamak fusion reactor. This system of equations is characterized by multiple time and spatial scales, and contains highly anisotropic transport coefficients due to a strong imposed magnetic field. We use Newton`s method to linearize the nonlinear system of equations resulting from an implicit, finite volume discretization of the governing partial differential equations, on a staggered Cartesian mesh. The resulting linear systems are neither symmetric nor positive definite, and are poorly conditioned. Preconditioned Krylov iterative techniques are employed to solve these linear systems. We investigate both a modified and a matrix-free Newton-Krylov implementation, with the goal of reducing CPU cost associated with the numerical formation of the Jacobian. A combination of a damped iteration, one-way multigrid and a pseudo-transient continuation technique are used to enhance global nonlinear convergence and CPU efficiency. GMRES is employed as the Krylov method with Incomplete Lower-Upper(ILU) factorization preconditioning. The goal is to construct a combination of nonlinear and linear iterative techniques for this complex physical problem that optimizes trade-offs between robustness, CPU time, memory requirements, and code complexity. It is shown that a one-way multigrid implementation provides significant CPU savings for fine grid calculations. Performance comparisons of the modified Newton-Krylov and matrix-free Newton-Krylov algorithms will be presented.

  12. Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates

    Energy Technology Data Exchange (ETDEWEB)

    Brennan, Christopher J.; Neumann, Christopher M.; Vitale, Steven A., E-mail: steven.vitale@ll.mit.edu [Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02420 (United States)

    2015-07-28

    Fully depleted silicon-on-insulator transistors were fabricated using two different metal gate deposition mechanisms to compare plasma damage effects on gate oxide quality. Devices fabricated with both plasma-enhanced atomic-layer-deposited (PE-ALD) TiN gates and magnetron plasma sputtered TiN gates showed very good electrostatics and short-channel characteristics. However, the gate oxide quality was markedly better for PE-ALD TiN. A significant reduction in interface state density was inferred from capacitance-voltage measurements as well as a 1200× reduction in gate leakage current. A high-power magnetron plasma source produces a much higher energetic ion and vacuum ultra-violet (VUV) photon flux to the wafer compared to a low-power inductively coupled PE-ALD source. The ion and VUV photons produce defect states in the bulk of the gate oxide as well as at the oxide-silicon interface, causing higher leakage and potential reliability degradation.

  13. Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates

    Science.gov (United States)

    Brennan, Christopher J.; Neumann, Christopher M.; Vitale, Steven A.

    2015-07-01

    Fully depleted silicon-on-insulator transistors were fabricated using two different metal gate deposition mechanisms to compare plasma damage effects on gate oxide quality. Devices fabricated with both plasma-enhanced atomic-layer-deposited (PE-ALD) TiN gates and magnetron plasma sputtered TiN gates showed very good electrostatics and short-channel characteristics. However, the gate oxide quality was markedly better for PE-ALD TiN. A significant reduction in interface state density was inferred from capacitance-voltage measurements as well as a 1200× reduction in gate leakage current. A high-power magnetron plasma source produces a much higher energetic ion and vacuum ultra-violet (VUV) photon flux to the wafer compared to a low-power inductively coupled PE-ALD source. The ion and VUV photons produce defect states in the bulk of the gate oxide as well as at the oxide-silicon interface, causing higher leakage and potential reliability degradation.

  14. Vitamin D intake and risk of CVD and all-cause mortality: evidence from the Caerphilly Prospective Cohort Study.

    Science.gov (United States)

    Guo, Jing; Cockcroft, John R; Elwood, Peter C; Pickering, Janet E; Lovegrove, Julie A; Givens, David I

    2017-10-01

    Prospective data on the associations between vitamin D intake and risk of CVD and all-cause mortality are limited and inconclusive. The aim of the present study was to investigate the associations between vitamin D intake and CVD risk and all-cause mortality in the Caerphilly Prospective Cohort Study. The associations of vitamin D intake with CVD risk markers were examined cross-sectionally at baseline and longitudinally at 5-year, 10-year and >20-year follow-ups. In addition, the predictive value of vitamin D intake for CVD events and all-cause mortality after >20 years of follow-up was examined. Logistic regression and general linear regression were used for data analysis. Participants in the UK. Men (n 452) who were free from CVD and type 2 diabetes at recruitment. Higher vitamin D intake was associated with increased HDL cholesterol (P=0·003) and pulse pressure (P=0·04) and decreased total cholesterol:HDL cholesterol (P=0·008) cross-sectionally at baseline, but the associations were lost during follow-up. Furthermore, higher vitamin D intake was associated with decreased concentration of plasma TAG at baseline (P=0·01) and at the 5-year (P=0·01), but not the 10-year examination. After >20 years of follow-up, vitamin D was not associated with stroke (n 72), myocardial infarctions (n 142), heart failure (n 43) or all-cause mortality (n 281), but was positively associated with increased diastolic blood pressure (P=0·03). The study supports associations of higher vitamin D intake with lower fasting plasma TAG and higher diastolic blood pressure.

  15. Plasma calprotectin and its association with cardiovascular disease manifestations, obesity and the metabolic syndrome in type 2 diabetes mellitus patients

    DEFF Research Database (Denmark)

    Pedersen, Lise; Nybo, M.; Poulsen, M. K.

    2014-01-01

    Background: Plasma calprotectin is a potential biomarker of cardiovascular disease (CVD), insulin resistance (IR), and obesity. We examined the relationship between plasma calprotectin concentrations, CVD manifestations and the metabolic syndrome (MetS) in patients with type 2 diabetes mellitus (T2...... associated with obesity, MetS status, autonomic neuropathy, PAD, and MI. However, plasma calprotectin was not an independent predictor of CVD, MI, autonomic neuropathy or PAD....

  16. CD4/CD8 ratio is not predictive of multi-morbidity prevalence in HIV-infected patients but identify patients with higher CVD risk

    Directory of Open Access Journals (Sweden)

    Marianna Menozzi

    2014-11-01

    Full Text Available Background: CD4/CD8=2006. High CVD risk was defined for Framingham Risk Score (FRS≥6. Subclinical CVD was defined using cardiac CT scan for calcium score (CAC≥100. Logistic univariate and multivariable adjusted analysis were performed to assess relationships between variables. Results: Demographic and HIV-specific variables distribution in patients with and without MM are shown in Table 1. Figure 1 shows HANA distribution across CD4/CD8 strata: CVD prevalence only appeared to be higher in patients with no CD4/CD8>0.8.In multivariable analyses CD4/CD8<0.8 was not an independent predictor of MM (OR=1.225, CI 0.891; 1.681, p=0.211 after adjustment for age, gender and BMI. Patients with CD4/CD8<0.8 displayed higher CVD risk but not higher prevalence of subclinical CVD. At multivariable analyses CD4/CD8<0.8 remained predictor of higher CVD risk (OR=0.65, CI 0.47–0.917, p=0.014 after correction for sex, BMI, age strata and HIV infection duration. Conclusions: Low CD4/CD8 ratio was not associated with MM prevalence. Patients with CD4/CD8<0.8 ratio displayed higher prevalence of CVD. At multivariable logistic regression CD4/CD8<0.8 is an independent prepredictor of enhanced CVD risk. This may support role of immune-activation/senescence in the pathogenesis of CVD.

  17. Surface modification of silicon-containing fluorocarbon films prepared by plasma-enhanced chemical vapor deposition

    Science.gov (United States)

    Jin, Yoonyoung; Desta, Yohannes; Goettert, Jost; Lee, G. S.; Ajmera, P. K.

    2005-07-01

    Surface modification of silicon-containing fluorocarbon (SiCF) films achieved by wet chemical treatments and through x-ray irradiation is examined. The SiCF films were prepared by plasma-enhanced chemical vapor deposition, using gas precursors of tetrafluoromethane and disilane. As-deposited SiCF film composition was analyzed by x-ray photoelectron spectroscopy. Surface modification of SiCF films utilizing n-lithiodiaminoethane wet chemical treatment is discussed. Sessile water-drop contact angle changed from 95°+/-2° before treatment to 32°+/-2° after treatment, indicating a change in the film surface characteristics from hydrophobic to hydrophilic. For x-ray irradiation on the SiCF film with a dose of 27.4 kJ/cm3, the contact angle of the sessile water drop changed from 95°+/-2° before radiation to 39°+/-3° after x-ray exposure. The effect of x-ray exposure on chemical bond structure of SiCF films is studied using Fourier transform infrared measurements. Electroless Cu deposition was performed to test the applicability of the surface modified films. The x-ray irradiation method offers a unique advantage in making possible surface modification in a localized area of high-aspect-ratio microstructures. Fabrication of a Ti-membrane x-ray mask is introduced here for selective surface modification using x-ray irradiation.

  18. Use of plasma enhanced ALD to construct efficient interference filters for astronomy in the FUV

    Science.gov (United States)

    Scowen, Paul A.; Nemanich, Robert; Eller, Brianna; Yu, Hongbin; Mooney, Tom; Beasley, Matt

    2016-07-01

    Over the past few years the advent of atomic layer deposition (ALD) technology has opened new capabilities to the field of coatings deposition for use in optical elements. At the same time, there have been major advances in both optical designs and detector technologies that can provide orders of magnitude improvement in throughput in the far ultraviolet (FUV) and near ultraviolet (NUV) passbands. Recent review work has shown that a veritable revolution is about to happen in astronomical diagnostic work for targets ranging from protostellar and protoplanetary systems, to the intergalactic medium that feeds gas supplies for galactic star formation, and supernovae and hot gas from star forming regions that determine galaxy formation feedback. These diagnostics are rooted in access to a forest of emission and absorption lines in the ultraviolet (UV)[1], and all that prevents this advance is the lack of throughput in such systems, even in space-based conditions. We outline an approach to use a range of materials to implement stable optical layers suitable for protective overcoats with high UV reflectivity and unprecedented uniformity, and use that capability to leverage innovative ultraviolet/optical filter construction to enable astronomical science. These materials will be deposited in a multilayer format over a metal base to produce a stable construct. Specifically, we will employ the use of PEALD (plasma-enhanced atomic layer deposition) methods for the deposition and construction of reflective layers that can be used to construct unprecedented filter designs for use in the ultraviolet.

  19. Characterization of diamond-like nanocomposite thin films grown by plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Santra, T. S.; Liu, C. H.; Bhattacharyya, T. K.; Patel, P.; Barik, T. K.

    2010-06-01

    Diamond-like nanocomposite (DLN) thin films, comprising the networks of a-C:H and a-Si:O were deposited on pyrex glass or silicon substrate using gas precursors (e.g., hexamethyldisilane, hexamethyldisiloxane, hexamethyldisilazane, or their different combinations) mixed with argon gas, by plasma enhanced chemical vapor deposition technique. Surface morphology of DLN films was analyzed by atomic force microscopy. High-resolution transmission electron microscopic result shows that the films contain nanoparticles within the amorphous structure. Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to determine the structural change within the DLN films. The hardness and friction coefficient of the films were measured by nanoindentation and scratch test techniques, respectively. FTIR and XPS studies show the presence of CC, CH, SiC, and SiH bonds in the a-C:H and a-Si:O networks. Using Raman spectroscopy, we also found that the hardness of the DLN films varies with the intensity ratio ID/IG. Finally, we observed that the DLN films has a better performance compared to DLC, when it comes to properties like high hardness, high modulus of elasticity, low surface roughness and low friction coefficient. These characteristics are the critical components in microelectromechanical systems (MEMS) and emerging nanoelectromechanical systems (NEMS).

  20. Electrical transport properties of graphene nanowalls grown at low temperature using plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Zhao, Rong; Ahktar, Meysam; Alruqi, Adel; Dharmasena, Ruchira; Jasinski, Jacek B.; Thantirige, Rukshan M.; Sumanasekera, Gamini U.

    2017-05-01

    In this work, we report the electrical transport properties of uniform and vertically oriented graphene (graphene nanowalls) directly synthesized on multiple substrates including glass, Si/SiO2 wafers, and copper foils using radio-frequency plasma enhanced chemical vapor deposition (PECVD) with methane (CH4) as the precursor at relatively low temperatures. The temperature for optimum growth was established with the aid of transmission electron microscopy, scanning electron microscopy, and Raman spectroscopy. This approach offers means for low-cost graphene nanowalls growth on an arbitrary substrate with the added advantage of transfer-free device fabrication. The temperature dependence of the electrical transport properties (resistivity and thermopower) were studied in the temperature range, 30-300 K and analyzed with a combination of 2D-variable range hopping (VRH) and thermally activated (TA) conduction mechanisms. An anomalous temperature dependence of the thermopower was observed for all the samples and explained with a combination of a diffusion term having a linear temperature dependence plus a term with an inverse temperature dependence.

  1. Switchable hydrophobic-hydrophilic layer obtained onto porous alumina by plasma-enhanced fluorination

    Institute of Scientific and Technical Information of China (English)

    A.TRESSAUD; C.LABRUG(E)RE; E.DURAND; C.BRIGOULEIX; H.ANDRIESSEN

    2009-01-01

    Conventional lithographic printing processes using porous alumina for offset applications generally use "wet" routes. Recently "dry" processes have been developed which are based on a heat-induced hydrophilic/oleophilic conversion of one or more layers of the coating so that a stronger affinity to-wards ink or water fountain is created at the exposed areas with respect to the surface of the unex-posed coating. Treatments involving rf plasma-enhanced fluorination (PEF) constitute exceptional tools for modifying the surface properties of materials. Many advantages of these techniques can be indeed outlined, when compared to more conventional methods: room-temperature reactions, chemical modi-fications limited to surface only without changing the bulk properties, possible non-equilibrium reac-tions. The influence of PEF treatments on porous alumina layer used in printing plates has been tested with various fluorinated gases (CF4, C3F8and C4F8) and characterized by XPS. The hydrophobic prop-erties of the fluorinated layer have been deduced from contact angle measurements. Using C4Fs rf-PEF treatment, the outmost surface of the hydrophilic alumina substrate used for lithographic printing is hydrophobized, or in other words, the hydrophilic substrate is converted into a support with hydro-phobic properties. Once being hydrophobized, the surface layer may be rendered hydrophilic using a heat pulse, thus giving rise to switchable hydrophobic-hydrophilic properties of the material.

  2. Plasma Enhanced Chemical Vapor Deposition Nanocrystalline Tungsten Carbide Thin Film and Its Electro-catalytic Activity

    Institute of Scientific and Technical Information of China (English)

    Huajun ZHENG; Chunan MA; Jianguo HUANG; Guohua LI

    2005-01-01

    Nanocrystalline tungsten carbide thin films were fabricated on graphite substrates by plasma enhanced chemical vapor deposition (PECVD) at H2 and Ar atmosphere, using WF6 and CH4 as precursors. The crystal phase, structure and chemical components of the films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and energy-dispersive spectrometer (EDS), respectively. The results show that the film prepared at CH4/WF6concentration ratio of 20 and at 800℃ is composed of spherical particles with a diameter of 20~35 nm. Electrochemical investigations show that the electrochemical real surface area of electrode of the film is large, and the electrode of the film exhibits higher electro-catalytic activity in the reaction of methanol oxidation. The designated constant current of the film catalyst is 123.6 mA/cm2 in the mixture solution of H2SO4 and CH3OH at the concentration of 0.5 and 2.0 mol/L at 70℃, and the designated constant potential is only 0.306 V (vs SCE).

  3. FTIR Characterization of Fluorine Doped Silicon Dioxide Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition

    Institute of Scientific and Technical Information of China (English)

    WANG Peng-Fei; DING Shi-Jin; ZHANG Wei; ZHANG Jian-Yun; WANGJi-Tao; WEI William Lee

    2000-01-01

    Fluorine doped silicon dioxide (SiOF) thin films have been prepared by plasma enhanced chemical vapor depo sition. The Fourier transform infrared spectrometry (FTIR) spectra of SiOF films are deliberated to reveal the structure change of SiO2 and the mechanism of dielectric constant reduction after doping fluorine. When F is doped in SiO2 films, the Si-O stretching absorption peak will have a blue-shift due to increase of the partial charge of the O atom. The FTIR spectra indicate that some Si-OH components in the thin film can be removed after doping fluorine. These changes reduce the ionic and orientational polarization, and result in the reduction in dielectric constant of the film. According to Gaussian fitting, it is found that the Si-F2 bonds will appear in the SiOF film with increase of the fluorine content. The Si-F2 structures are liable to react with water, and cause the same increase of absorbed moisture in the film.

  4. Chromium functionalized diglyme plasma polymer coating enhances enzyme-linked immunosorbent assay performance.

    Science.gov (United States)

    Welch, Nicholas G; Madiona, Robert M T; Easton, Christopher D; Scoble, Judith A; Jones, Robert T; Muir, Benjamin W; Pigram, Paul J

    2016-11-10

    Ensuring the optimum orientation, conformation, and density of substrate-bound antibodies is critical for the success of sandwich enzyme-linked immunosorbent assays (ELISAs). In this work, the authors utilize a diethylene glycol dimethyl ether plasma polymer (DGpp) coating, functionalized with chromium within a 96 well plate for the enhanced immobilization of a capture antibody. For an equivalent amount of bound antibody, a tenfold improvement in the ELISA signal intensity is obtained on the DGpp after incubation with chromium, indicative of improved orientation on this surface. Time-of-flight secondary-ion-mass-spectrometry (ToF-SIMS) and principal component analysis were used to probe the molecular species at the surface and showed ion fragments related to lysine, methionine, histidine, and arginine coupled to chromium indicating candidate antibody binding sites. A combined x-ray photoelectron spectroscopy and ToF-SIMS analysis provided a surface molecular characterization that demonstrates antibody binding via the chromium complex. The DGpp+Cr surface treatment holds great promise for improving the efficacy of ELISAs.

  5. Chain Assemblies from Nanoparticles Synthesized by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition: The Computational View.

    Science.gov (United States)

    Mishin, Maxim V; Zamotin, Kirill Y; Protopopova, Vera S; Alexandrov, Sergey E

    2015-12-01

    This article refers to the computational study of nanoparticle self-organization on the solid-state substrate surface with consideration of the experimental results, when nanoparticles were synthesised during atmospheric pressure plasma enhanced chemical vapor deposition (AP-PECVD). The experimental study of silicon dioxide nanoparticle synthesis by AP-PECVD demonstrated that all deposit volume consists of tangled chains of nanoparticles. In certain cases, micron-sized fractals are formed from tangled chains due to deposit rearrangement. This work is focused on the study of tangled chain formation only. In order to reveal their formation mechanism, a physico-mathematical model was developed. The suggested model was based on the motion equation solution for charged and neutral nanoparticles in the potential fields with the use of the empirical interaction potentials. In addition, the computational simulation was carried out based on the suggested model. As a result, the influence of such experimental parameters as deposition duration, particle charge, gas flow velocity, and angle of gas flow was found. It was demonstrated that electrical charges carried by nanoparticles from the discharge area are not responsible for the formation of tangled chains from nanoparticles, whereas nanoparticle kinetic energy plays a crucial role in deposit morphology and density. The computational results were consistent with experimental results.

  6. Switchable hydrophobic-hydrophilic layer obtained onto porous alumina by plasma-enhanced fluorination

    Institute of Scientific and Technical Information of China (English)

    A.; TRESSAUD; C.; LABRUGèRE; E.; DURAND; C.; BRIGOULEIX; H.; ANDRIESSEN

    2009-01-01

    Conventional lithographic printing processes using porous alumina for offset applications generally use "wet" routes. Recently "dry" processes have been developed which are based on a heat-induced hydrophilic/oleophilic conversion of one or more layers of the coating so that a stronger affinity to-wards ink or water fountain is created at the exposed areas with respect to the surface of the unex-posed coating. Treatments involving rf plasma-enhanced fluorination (PEF) constitute exceptional tools for modifying the surface properties of materials. Many advantages of these techniques can be indeed outlined, when compared to more conventional methods: room-temperature reactions, chemical modi-fications limited to surface only without changing the bulk properties, possible non-equilibrium reac-tions. The influence of PEF treatments on porous alumina layer used in printing plates has been tested with various fluorinated gases (CF4, C3F8 and C4F8) and characterized by XPS. The hydrophobic prop-erties of the fluorinated layer have been deduced from contact angle measurements. Using C4F8 rf-PEF treatment, the outmost surface of the hydrophilic alumina substrate used for lithographic printing is hydrophobized, or in other words, the hydrophilic substrate is converted into a support with hydro-phobic properties. Once being hydrophobized, the surface layer may be rendered hydrophilic using a heat pulse, thus giving rise to switchable hydrophobic-hydrophilic properties of the material.

  7. Enhancement of the kerr effect in Co-Ag granular films near the plasma edge

    CERN Document Server

    Chen, L Y; Zhang, R J; Zheng, W M; Zheng, Y X; Yang, Y M; Li, B Y

    1999-01-01

    A series of Co sub x Ag sub 1 sub 0 sub 0 sub - sub x granular films was annealed at 100, 250, 400, and 500 .deg. C. Both the dielectric function and the polar Kerr-effect spectra were measured using a spectroscopic ellipsometers and a magneto-optical spectrometer in the 1.5 - to 4.5 - eV phonon-energy range. It was found that the Kerr effect was greatly enhanced by increasing the annealing temperature, especially for those samples having low Co compositions. After annealing, strong resonance peaks appeared in the 3.7 - to 4.1 - eV range for low Co-concentration thin films. In terms of the optical constant and the magneto-optical quantity epsilon sub x sub y , the line shape of the Kerr spectrum and its origin were analyzed. The peaks are attributed to joint contributions from the plasma oscillation and the onset of the interband transition mainly related to the band structure of the enlarged Co and Ag particles in the granular film after annealing.

  8. Growth of nanocrystalline silicon carbide thin films by plasma enhanced chemical vapor deposition

    CERN Document Server

    Lee, S W; Moon, J Y; Ahn, S S; Kim, H Y; Shin, D H

    1999-01-01

    Nanocrystalline silicon carbide thin films have been deposited by plasma enhanced chemical vapor deposition (PECVD) using SiH sub 4 , CH sub 4 , and H sub 2 gases. The effects of gas mixing ratio (CH sub 4 /SiH sub 4), deposition temperature, and RF power on the film properties have been studied. The growth rate, refractive index, and the optical energy gap depends critically on the growth conditions. The dependence of the growth rate on the gas flow ratio is quite different from the results obtained for the growth using C sub 2 H sub 2 gas instead of CH sub 4. As the deposition temperature is increased from 300 .deg. C to 600 .deg. C, hydrogen and carbon content in the film decreases and as a result the optical gap decreases. At the deposition temperature of 600 .deg. C and RF power of 150 W, the film structure si nanocrystalline, As the result of the nanocrystallization the dark conductivity is greatly improved. The nanocrystalline silicon carbide thin films may be used for large area optoelectronic devices...

  9. Boron nitride nanowalls: low-temperature plasma-enhanced chemical vapor deposition synthesis and optical properties

    Science.gov (United States)

    Merenkov, Ivan S.; Kosinova, Marina L.; Maximovskii, Eugene A.

    2017-05-01

    Hexagonal boron nitride (h-BN) nanowalls (BNNWs) were synthesized by plasma-enhanced chemical vapor deposition (PECVD) from a borazine (B3N3H6) and ammonia (NH3) gas mixture at a low temperature range of 400 °C-600 °C on GaAs(100) substrates. The effect of the synthesis temperature on the structure and surface morphology of h-BN films was investigated. The length and thickness of the h-BN nanowalls were in the ranges of 50-200 nm and 15-30 nm, respectively. Transmission electron microscope images showed the obtained BNNWs were composed of layered non-equiaxed h-BN nanocrystallites 5-10 nm in size. The parallel-aligned h-BN layers as an interfacial layer were observed between the film and GaAs(100) substrate. BNNWs demonstrate strong blue light emission, high transparency (>90%) both in visible and infrared spectral regions and are promising for optical applications. The present results enable a convenient growth of BNNWs at low temperatures.

  10. Wetting behaviour of carbon nitride nanostructures grown by plasma enhanced chemical vapour deposition technique

    Science.gov (United States)

    Ahmad Kamal, Shafarina Azlinda; Ritikos, Richard; Abdul Rahman, Saadah

    2015-02-01

    Tuning the wettability of various coating materials by simply controlling the deposition parameters is essential for various specific applications. In this work, carbon nitride (CNx) films were deposited on silicon (1 1 1) substrates using radio-frequency plasma enhanced chemical vapour deposition employing parallel plate electrode configuration. Effects of varying the electrode distance (DE) on the films' structure and bonding properties were investigated using Field emission scanning electron microscopy, Atomic force microscopy, Fourier transform infrared and X-ray photoemission spectroscopy. The wettability of the films was analyzed using water contact angle measurements. At high DE, the CNx films' surface was smooth and uniform. This changed into fibrous nanostructures when DE was decreased. Surface roughness of the films increased with this morphological transformation. Nitrogen incorporation increased with decrease in DE which manifested the increase in both relative intensities of Cdbnd N to Cdbnd C and Nsbnd H to Osbnd H bonds. sp2-C to sp3-C ratio increased as DE decreased due to greater deformation of sp2 bonded carbon at lower DE. The films' characteristics changed from hydrophilic to super-hydrophobic with the decrease in DE. Roughness ratio, surface porosity and surface energy calculated from contact angle measurements were strongly dependent on the morphology, surface roughness and bonding properties of the films.

  11. Stress control of silicon nitride films deposited by plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Li, Dong-ling; Feng, Xiao-fei; Wen, Zhi-yu; Shang, Zheng-guo; She, Yin

    2016-07-01

    Stress controllable silicon nitride (SiNx) films deposited by plasma enhanced chemical vapor deposition (PECVD) are reported. Low stress SiNx films were deposited in both high frequency (HF) mode and dual frequency (HF/LF) mode. By optimizing process parameters, stress free (-0.27 MPa) SiNx films were obtained with the deposition rate of 45.5 nm/min and the refractive index of 2.06. Furthermore, at HF/LF mode, the stress is significantly influenced by LF ratio and LF power, and can be controlled to be 10 MPa with the LF ratio of 17% and LF power of 150 W. However, LF power has a little effect on the deposition rate due to the interaction between HF power and LF power. The deposited SiNx films have good mechanical and optical properties, low deposition temperature and controllable stress, and can be widely used in integrated circuit (IC), micro-electro-mechanical systems (MEMS) and bio-MEMS.

  12. Plasma-Sprayed ZnO/TiO2 Coatings with Enhanced Biological Performance

    Science.gov (United States)

    Zhao, Xiaobing; Peng, Chao; You, Jing

    2017-08-01

    Surface chemical composition and topography are two key factors in the biological performance of implants. The aim of this work is to deposit ZnO/TiO2 composite coatings on the surface of titanium substrates by plasma spraying technique. The effects of the amount of ZnO doping on the microstructure, surface roughness, corrosion resistance, and biological performance of the TiO2 coatings were investigated. The results indicated that the phase composition of the as-sprayed TiO2 coating was mainly rutile. Addition of 10% ZnO into TiO2 coating led to a slight shift of the diffraction peaks to lower angle. Anatase phase and Zn2TiO4 were formed in 20%ZnO/TiO2 and 30%ZnO/TiO2 coatings, respectively. Doping with ZnO changed the topography of the TiO2 coatings, which may be beneficial to enhance their biological performance. All coatings exhibited microsized surface roughness, and the corrosion resistance of ZnO/TiO2 coatings was improved compared with pure TiO2 coating. The ZnO/TiO2 coatings could induce apatite formation on their surface and inhibit growth of Staphylococcus aureus, but these effects were dose dependent. The 20%ZnO/TiO2 coating showed better biological performance than the other coatings, suggesting potential application for bone implants.

  13. Modelling of coal combustion enhanced through plasma-fuel systems in full-scale boilers

    Energy Technology Data Exchange (ETDEWEB)

    A.S. Askarova; Z. Jankoski; E.I. Karpenko; E.I. Lavrischeva; F.C. Lockwood; V.E. Messerle; A.B. Ustimenko [al-Farabi Kazakh National University, Almaty (Kazakhstan). Department of Physics

    2005-07-01

    Plasma activation promotes more effective and environmental friendly low-rank coal combustion. This work presents numerical modelling results of plasma thermochemical preparation of pulverized coal for ignition and combustion in the furnace of a utility boiler. Two kinetic mathematical models were used in the investigation of the processes of air-fuel mixture plasma activation, ignition and combustion. A 1D kinetic code, PLASMA-COAL, calculates the concentrations of species, temperatures and velocities of treated coal-air mixtures in a burner incorporating a plasma source. It gives initial data for 3D-modeling of power boilers furnaces by the code FLOREAN. A comprehensive image of plasma activated coal combustion processes in a furnace of pulverised coal fired boiler was obtained. The advantages of the plasma technology are clearly demonstrated. 15 refs., 6 figs., 4 tabs.

  14. Pulsed ion sheath dynamics in a cylindrical bore for inner surface grid-enhanced plasma source ion implantation

    CERN Document Server

    Wang Jiu Li; Fan Song Hua; Yang Wu Bao; Yang Size

    2002-01-01

    Based on authors' recently proposed grid-enhanced plasma source ion implantation (GEPSII) technique for inner surface modification of materials with cylindrical geometry, the authors present the corresponding theoretical studies of the temporal evolution of the plasma ion sheath between the grid electrode and the target in a cylindrical bore. Typical results such as the ion sheath evolution, time-dependent ion density and time-integrated ion energy distribution at the target are calculated by solving Poisson's equation coupled with fluid equations for collisionless ions and Boltzmann assumption for electrons using finite difference methods. The calculated results can further verify the feasibility and superiority of this new technique

  15. Laser-energy transfer and enhancement of plasma waves and electron beams by interfering high-intensity laser pulses.

    Science.gov (United States)

    Zhang, P; Saleh, N; Chen, S; Sheng, Z M; Umstadter, D

    2003-11-28

    The effects of interference due to crossed laser beams were studied experimentally in the high-intensity regime. Two ultrashort (400 fs), high-intensity (4 x 10(17) and 1.6 x 10(18) W/cm(2)) and 1 microm wavelength laser pulses were crossed in a plasma of density 4 x 10(19) cm(3). Energy was observed to be transferred from the higher-power to the lower-power pulse, increasing the amplitude of the plasma wave propagating in the direction of the latter. This results in increased electron self-trapping and plasma-wave acceleration gradient, which led to an increased number of hot electrons (by 300%) and hot-electron temperature (by 70%) and a decreased electron-beam divergence angle (by 45%), as compared with single-pulse illumination. Simulations reveal that increased stochastic heating of electrons may have also contributed to the electron-beam enhancement.

  16. Hydrogen and oxygen plasma enhancement in the Cu electrodeposition and consolidation processes on BDD electrode applied to nitrate reduction

    Science.gov (United States)

    Couto, A. B.; Santos, L. C. D.; Matsushima, J. T.; Baldan, M. R.; Ferreira, N. G.

    2011-09-01

    Copper nanoparticle electrodeposition and consolidation processes were studied on boron doped diamond (BDD) electrode submitted to hydrogen and oxygen plasma treatments. The modified BDD films were applied as electrodes for nitrate electroreduction. The results showed that both treatments have a strong influence on the copper deposition and dissolution processes. For BDD treated with hydrogen plasma the copper electrodeposit was homogeneous with high particle density. This behavior was attributed to the BDD surface hydrogenation that improved its conductivity. On the other hand, the treatment with oxygen plasma was important for the copper nanoparticle consolidation on BDD surface, confirmed by the result's reproducibility for nitrate reduction. This performance may be associated with the formation of oxygen groups that can act as anchor points for Cu-clusters, enhancing the interfacial adhesion between diamond and the metal coating. The best electrochemical nitrate reduction response was obtained in acid media, where occurred the separation of the nitrate reduction process and the water reduction reaction.

  17. Whistler wave radiation from a pulsed loop antenna located in a cylindrical duct with enhanced plasma density

    Energy Technology Data Exchange (ETDEWEB)

    Kudrin, Alexander V.; Shkokova, Natalya M. [Department of Radiophysics, University of Nizhny Novgorod, 23 Gagarin Ave., Nizhny Novgorod 603950 (Russian Federation); Ferencz, Orsolya E. [MTA Research Centre for Astronomy and Earth Sciences, Csatkai E. u. 6–8, Sopron H-9400 (Hungary); Zaboronkova, Tatyana M. [Department of Radiophysics, University of Nizhny Novgorod, 23 Gagarin Ave., Nizhny Novgorod 603950 (Russian Federation); Department of Nuclear Physics, R. E. Alekseev State Technical University of Nizhny Novgorod, 24 Minin St., Nizhny Novgorod 603950 (Russian Federation)

    2014-11-15

    Pulsed radiation from a loop antenna located in a cylindrical duct with enhanced plasma density is studied. The radiated energy and its distribution over the spatial and frequency spectra of the excited waves are derived and analyzed as functions of the antenna and duct parameters. Numerical results referring to the case where the frequency spectrum of the antenna current is concentrated in the whistler range are reported. It is shown that under ionospheric conditions, the presence of an artificial duct with enhanced density can lead to a significant increase in the energy radiated from a pulsed loop antenna compared with the case where the same source is immersed in the surrounding uniform magnetoplasma. The results obtained can be useful in planning active ionospheric experiments with pulsed electromagnetic sources operated in the presence of artificial field-aligned plasma density irregularities that are capable of guiding whistler waves.

  18. Signal enhancement of neutral He emission lines by fast electron bombardment of laser-induced He plasma

    Directory of Open Access Journals (Sweden)

    Hery Suyanto

    2016-08-01

    Full Text Available A time-resolved spectroscopic study is performed on the enhancement signals of He gas plasma emission using nanosecond (ns and picosecond (ps lasers in an orthogonal configuration. The ns laser is used for the He gas plasma generation and the ps laser is employed for the ejection of fast electrons from a metal target, which serves to excite subsequently the He atoms in the plasma. The study is focused on the most dominant He I 587.6 nm and He I 667.8 nm emission lines suggested to be responsible for the He-assisted excitation (HAE mechanism. The time-dependent intensity enhancements induced by the fast electrons generated with a series of delayed ps laser ablations are deduced from the intensity time profiles of both He emission lines. The results clearly lead to the conclusion that the metastable excited triplet He atoms are actually the species overwhelmingly produced during the recombination process in the ns laser-induced He gas plasma. These metastable He atoms are believed to serve as the major energy source for the delayed excitation of analyte atoms in ns laser-induced breakdown spectroscopy (LIBS using He ambient gas.

  19. Signal enhancement of neutral He emission lines by fast electron bombardment of laser-induced He plasma

    Science.gov (United States)

    Suyanto, Hery; Pardede, Marincan; Hedwig, Rinda; Marpaung, Alion Mangasi; Ramli, Muliadi; Lie, Tjung Jie; Abdulmadjid, Syahrun Nur; Kurniawan, Koo Hendrik; Tjia, May On; Kagawa, Kiichiro

    2016-08-01

    A time-resolved spectroscopic study is performed on the enhancement signals of He gas plasma emission using nanosecond (ns) and picosecond (ps) lasers in an orthogonal configuration. The ns laser is used for the He gas plasma generation and the ps laser is employed for the ejection of fast electrons from a metal target, which serves to excite subsequently the He atoms in the plasma. The study is focused on the most dominant He I 587.6 nm and He I 667.8 nm emission lines suggested to be responsible for the He-assisted excitation (HAE) mechanism. The time-dependent intensity enhancements induced by the fast electrons generated with a series of delayed ps laser ablations are deduced from the intensity time profiles of both He emission lines. The results clearly lead to the conclusion that the metastable excited triplet He atoms are actually the species overwhelmingly produced during the recombination process in the ns laser-induced He gas plasma. These metastable He atoms are believed to serve as the major energy source for the delayed excitation of analyte atoms in ns laser-induced breakdown spectroscopy (LIBS) using He ambient gas.

  20. Signal enhancement of neutral He emission lines by fast electron bombardment of laser-induced He plasma

    Energy Technology Data Exchange (ETDEWEB)

    Suyanto, Hery [Department of Physics, Faculty of Mathematics and Natural Sciences, Udayana University, Kampus Bukit Jimbaran, Denpasar 80361, Bali (Indonesia); Pardede, Marincan [Department of Electrical Engineering, University of Pelita Harapan, 1100 M.H. Thamrin Boulevard, Lippo Village, Tangerang 15811 (Indonesia); Hedwig, Rinda [Department of Computer Engineering, Bina Nusantara University, 9 K.H. Syahdan, Jakarta 14810 (Indonesia); Marpaung, Alion Mangasi [Department of Physics, Faculty of Mathematics and Natural Sciences, Jakarta State University, Rawamangun, Jakarta 12440 (Indonesia); Ramli, Muliadi [Department of Chemistry, Faculty of Mathematics and Natural Sciences, Syiah Kuala University, Darussalam, Banda Aceh 23111, NAD (Indonesia); Lie, Tjung Jie; Kurniawan, Koo Hendrik, E-mail: kurnia18@cbn.net.id [Research Center of Maju Makmur Mandiri Foundation, 40 Srengseng Raya, Kembangan, Jakarta Barat 11630 (Indonesia); Abdulmadjid, Syahrun Nur [Department of Physics, Faculty of Mathematics and Natural Sciences, Syiah Kuala University, Darussalam, Banda Aceh 23111, NAD (Indonesia); Tjia, May On [Research Center of Maju Makmur Mandiri Foundation, 40 Srengseng Raya, Kembangan, Jakarta Barat 11630 (Indonesia); Physics of Magnetism and Photonics Group, Faculty of Mathematics and Natural Sciences, Bandung Institute of Technology, 10 Ganesha,Bandung 40132 (Indonesia); Kagawa, Kiichiro [Research Center of Maju Makmur Mandiri Foundation, 40 Srengseng Raya, Kembangan, Jakarta Barat 11630 (Indonesia); Fukui Science Education Academy, Takagi Chuo 2 chome, Fukui 910-0804 (Japan)

    2016-08-15

    A time-resolved spectroscopic study is performed on the enhancement signals of He gas plasma emission using nanosecond (ns) and picosecond (ps) lasers in an orthogonal configuration. The ns laser is used for the He gas plasma generation and the ps laser is employed for the ejection of fast electrons from a metal target, which serves to excite subsequently the He atoms in the plasma. The study is focused on the most dominant He I 587.6 nm and He I 667.8 nm emission lines suggested to be responsible for the He-assisted excitation (HAE) mechanism. The time-dependent intensity enhancements induced by the fast electrons generated with a series of delayed ps laser ablations are deduced from the intensity time profiles of both He emission lines. The results clearly lead to the conclusion that the metastable excited triplet He atoms are actually the species overwhelmingly produced during the recombination process in the ns laser-induced He gas plasma. These metastable He atoms are believed to serve as the major energy source for the delayed excitation of analyte atoms in ns laser-induced breakdown spectroscopy (LIBS) using He ambient gas.

  1. Design and Development of an Acoustic Levitation System for Use in CVD Growth of Carbon Nanotubes

    Science.gov (United States)

    Qasem, Amal ali

    The most widely used methods for growth of carbon nanotubes (CNTs) arc discharge, laser ablation, and chemical vapor deposition (CVD). Some of these methods have difficulties, such as controlling the quality and straightness of the nanotube in the synthesis of CNTs from substrates. Also, the enhanced plasma chemical vapor deposition method with the catalyst on a substrate produces straighter, larger diameter nanotubes by the tip growth method, but they are short. The difficulty in the floating catalyst method is that the nanotubes stay in the growth furnace for short times limiting growth to about one mm length; this method also leaves many catalyst impurities. One factor that limits CNT growth in these methods is the difficulty of getting enough carbon atoms to the growth catalyst to grow long nanotubes. The motivation of this work is that longer, higher quality nanotubes could be grown by increasing growth time and by increasing carbon atom movement to catalyst. The goal of this project is to use acoustic levitation to assist chemical vapor deposition growth by trapping and vibrating the growing CNTs for better properties. Our levitation system consists of a piezoelectric transducer attached to an aluminum horn and quartz rod extending into the growth furnace. The most important elements of our methods to achieve the acoustic levitation are as follows. 1. Using COMSOL Multi-physic Simulation software to determine the length of quartz rod needed to excite standing waves for levitation in the tube furnace. 2. Determining the resonance frequency of different transducers and horns. 3. Using ultrasound measurement to determine the time of flight, velocity of sound and sound wavelength of different horns. 4. Making Aluminum horns with the appropriate lengths. 5. Using ultrasound measurement to determine the changing of quartz rod velocity of sound and length in the furnace. 6. Mounting the transducer to booster horn and aluminum cylindrical horn above a reflector to

  2. Synthesis of CVD-graphene on rapidly heated copper foils.

    Science.gov (United States)

    Kim, Sang-Min; Kim, Jae-Hyun; Kim, Kwang-Seop; Hwangbo, Yun; Yoon, Jong-Hyuk; Lee, Eun-Kyu; Ryu, Jaechul; Lee, Hak-Joo; Cho, Seungmin; Lee, Seung-Mo

    2014-05-07

    Most chemical vapor deposition (CVD) systems used for graphene growth mainly employ convection and radiation heat transfer between the heating source and the metal catalyst in order to reach the activation temperature of the reaction, which in general leads to a long synthesis time and poor energy efficiency. Here, we report a highly time- and energy-efficient CVD setup, in which the metal catalyst (Cu) is designed to be physically contacted with a heating source to give quick heat transfer by conduction. The induced conduction heating enabled the usual effects of the pretreatment and annealing of Cu (i.e., annihilation of surface defects, impurities and contaminants) to be achieved in a significantly shorter time compared to conventional CVD. Notably, the rapid heating was observed to lead to larger grains of Cu with high uniformity as compared to the Cu annealed by conventional CVD, which are believed to be beneficial for the growth of high quality graphene. Through this CVD setup, bundles of high quality (∼252 Ω per square) and large area (over 16 inch) graphenes were able to be readily synthesized in 40 min in a significantly efficient way. When considering ease of scalability, high energy effectiveness and considerable productivity, our method is expected to be welcomed by industrialists.

  3. Phytoestrogens enhance antioxidant enzymes after swimming exercise and modulate sex hormone plasma levels in female swimmers.

    Science.gov (United States)

    Mestre-Alfaro, Antonia; Ferrer, Miguel D; Sureda, Antoni; Tauler, Pedro; Martínez, Elisa; Bibiloni, Maria M; Micol, Vicente; Tur, Josep A; Pons, Antoni

    2011-09-01

    Our aim was to investigate the effects of diet supplementation with phytoestrogens on sex hormone levels, antioxidant adaptive responses and oxidative damage induced by exercise. Ten female swimmers participated for 26 days in a diet intervention with either a functional beverage rich in vitamins C and E or the same beverage but also supplemented with Lippia citriodora extract (PLX) containing 20 mg/100 ml verbascoside. After the intervention all subjects participated in a swimming session for 30 min maintaining the intensity at about 75-80% of their individual best performance time for a 50-m swim. In lymphocytes, the superoxide dismutase activity increased after exercise, with a higher increase in the PLX group. Swimming increased the erythrocyte activity of glutathione peroxidase and glutathione reductase in the PLX group. Purified glutathione reductase activity increased after an in vitro incubation with PLX. No effects were observed on the lymphocyte levels of malondialdehyde and carbonyls, but exercise increased the percentage of high-damaged lymphocytes 2.8 times in the placebo group and 1.5 times in the PLX group. PLX decreased the levels of 17-β-estradiol and testosterone and increased the levels of the sex hormone binding globulin. In conclusion, supplementation with phytoestrogens enhances the glutathione-dependent enzyme activities in erythrocytes and the superoxide dismutase activity in lymphocytes in response to exercise. PLX also shows direct antioxidant properties, by increasing glutathione reductase enzyme activity in vitro. Supplementation with phytoestrogens also decreases the plasma steroid hormone levels, pointing towards a possible agonistic effect of verbascoside in the hypothalamic regulation of estradiol synthesis.

  4. Si-nanocrystal-based LEDs fabricated by ion implantation and plasma-enhanced chemical vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Peralvarez, M; Carreras, Josep; Navarro-Urrios, D; Lebour, Y; Garrido, B [MIND, IN2UB, Department of Electronics, University of Barcelona, C/Marti i Franques 1, PL2, E-08028 Barcelona (Spain); Barreto, J; DomInguez, C [IMB-CNM, CSIC, Bellaterra, E-08193 Barcelona (Spain); Morales, A, E-mail: mperalvarez@el.ub.e [INAOE, Electronics Department, Apartado 51, Puebla 72000 (Mexico)

    2009-10-07

    An in-depth study of the physical and electrical properties of Si-nanocrystal-based MOSLEDs is presented. The active layers were fabricated with different concentrations of Si by both ion implantation and plasma-enhanced chemical vapour deposition. Devices fabricated by ion implantation exhibit a combination of direct current and field-effect luminescence under a bipolar pulsed excitation. The onset of the emission decreases with the Si excess from 6 to 3 V. The direct current emission is attributed to impact ionization and is associated with the reasonably high current levels observed in current-voltage measurements. This behaviour is in good agreement with transmission electron microscopy images that revealed a continuous and uniform Si nanocrystal distribution. The emission power efficiency is relatively low, {approx}10{sup -3}%, and the emission intensity exhibits fast degradation rates, as revealed from accelerated ageing experiments. Devices fabricated by chemical deposition only exhibit field-effect luminescence, whose onset decreases with the Si excess from 20 to 6 V. The absence of the continuous emission is explained by the observation of a 5 nm region free of nanocrystals, which strongly reduces the direct current through the gate. The main benefit of having this nanocrystal-free region is that tunnelling current flow assisted by nanocrystals is blocked by the SiO{sub 2} stack so that power consumption is strongly reduced, which in return increases the device power efficiency up to 0.1%. In addition, the accelerated ageing studies reveal a 50% degradation rate reduction as compared to implanted structures.

  5. Plasma enhanced chemical vapor deposition of iron doped thin dioxide films, their structure and photowetting effect

    Energy Technology Data Exchange (ETDEWEB)

    Sobczyk-Guzenda, A., E-mail: anna.sobczyk-guzenda@p.lodz.pl [Institute of Materials Science and Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Lodz (Poland); Owczarek, S.; Szymanowski, H. [Institute of Materials Science and Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Lodz (Poland); Wypych-Puszkarz, A. [Department of Molecular Physics, Lodz University of Technology, Zeromskiego 116, 90-924 Lodz (Poland); Volesky, L. [Technical University of Liberec, Institute for Nanomaterials, Advanced Technologies and Innovation, Studentska 1402/2, 461 17 Liberec 1 (Czech Republic); Gazicki-Lipman, M. [Institute of Materials Science and Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Lodz (Poland)

    2015-08-31

    Radio frequency plasma enhanced chemical vapor deposition (RF PECVD) technique was applied for the purpose of deposition of iron doped titanium dioxide coatings from a gaseous mixture of oxygen with titanium (IV) chloride and iron (0) pentacarbonyl. Glass slides and silicon wafers were used as substrates. The coatings morphology was investigated using scanning electron microscopy (SEM) and atomic force microscopy (AFM). Their elemental and chemical composition was studied with the help of X-ray energy dispersive spectroscopy (EDS) and Fourier transform infrared (FTIR) spectroscopy, respectively, while their phase composition was analyzed with the Raman spectroscopy. For the determination of the film optical properties, ultraviolet (UV–Vis) spectroscopy techniques were used. Iron content in the range of 0.07 to 11.5 at.% was found in the coatings. FTIR studies showed that iron was built-in in the structure of TiO{sub 2} matrix. Surface roughness, assessed with the SEM and AFM techniques, increases with an increasing content of this element. Trace amounts of iron resulted in a lowering of an absorption threshold of the films and their optical gap, but the tendency was reversed for high concentrations of that element. The effect of iron doping on UV photowettability of the films was also studied and, for coatings containing up to 5% of iron, it was stronger than that exhibited by pure TiO{sub 2}. - Highlights: • Iron doped TiO{sub 2} films were deposited with the PECVD method. • Differences of surface morphology of the films with different iron content were shown. • Depending on the iron content, the film structure is either amorphous or crystalline. • A parabolic character of the optical gap dependence on the concentration of iron was observed. • Up to a concentration of 5% of iron, doped TiO{sub 2} films exhibit a super-hydrophilic effect.

  6. Gettering of interstitial iron in silicon by plasma-enhanced chemical vapour deposited silicon nitride films

    Science.gov (United States)

    Liu, A. Y.; Sun, C.; Markevich, V. P.; Peaker, A. R.; Murphy, J. D.; Macdonald, D.

    2016-11-01

    It is known that the interstitial iron concentration in silicon is reduced after annealing silicon wafers coated with plasma-enhanced chemical vapour deposited (PECVD) silicon nitride films. The underlying mechanism for the significant iron reduction has remained unclear and is investigated in this work. Secondary ion mass spectrometry (SIMS) depth profiling of iron is performed on annealed iron-contaminated single-crystalline silicon wafers passivated with PECVD silicon nitride films. SIMS measurements reveal a high concentration of iron uniformly distributed in the annealed silicon nitride films. This accumulation of iron in the silicon nitride film matches the interstitial iron loss in the silicon bulk. This finding conclusively shows that the interstitial iron is gettered by the silicon nitride films during annealing over a wide temperature range from 250 °C to 900 °C, via a segregation gettering effect. Further experimental evidence is presented to support this finding. Deep-level transient spectroscopy analysis shows that no new electrically active defects are formed in the silicon bulk after annealing iron-containing silicon with silicon nitride films, confirming that the interstitial iron loss is not due to a change in the chemical structure of iron related defects in the silicon bulk. In addition, once the annealed silicon nitride films are removed, subsequent high temperature processes do not result in any reappearance of iron. Finally, the experimentally measured iron decay kinetics are shown to agree with a model of iron diffusion to the surface gettering sites, indicating a diffusion-limited iron gettering process for temperatures below 700 °C. The gettering process is found to become reaction-limited at higher temperatures.

  7. Heat and Radiofrequency Plasma Glow Discharge Pretreatment of a Titanium Alloy: Eveidence for Enhanced Osteoinductive Properties

    Science.gov (United States)

    Rapuano, Bruce E.; Singh, Herman; Boskey, Adele L.; Doty, Stephen B.; MacDonald, Daniel E.

    2013-01-01

    It is believed that orthopedic and implant longevity can be improved by optimizing fixation, or direct bone-implant contact, through the stimulation of new bone formation around the implant. The purpose of this study was to determine whether heat (600°C) or radiofrequency plasma glow discharge (RFGD) pretreatment of Ti6Al4V stimulated calcium-phosphate mineral formation in cultures of attached MC3T3 osteoprogenitor cells with or without a fibronectin coating. Calcium-phosphate mineral was analyzed by flame atomic absorption spectrophotometry, scanning electron microscopy (SEM)/electron dispersive X-ray microanalysis (EDAX) and Fourier transformed infrared spectroscopy (FTIR). RFGD and heat pretreatments produced a general pattern of increased total soluble calcium levels, although the effect of heat pretreatment was greater than that of RFGD. SEM/EDAX showed the presence of calcium-and phosphorus-containing particles on untreated and treated disks that were more numerous on fibronectin-coated disks. These particles were observed earliest (1 week) on RFGD-pretreated surfaces. FTIR analyses showed that the heat pretreatment produced a general pattern of increased levels of apatite mineral at 2–4 weeks; a greater effect was observed for fibronectin-coated disks compared to uncoated disks. The observed findings suggest that heat pretreatment of Ti6Al4V increased the total mass of the mineral formed in MC3T3 osteoprogenitor cell cultures more than RFGD while the latter pretreatment hastened the early deposition of mineral. These findings help to support the hypothesis that the pretreatments enhance the osteoinductive properties of the alloy. PMID:23494951

  8. Influence of 60Co gamma radiation on fluorine plasma treated enhancement-mode highelectron-mobility transistor

    Institute of Scientific and Technical Information of China (English)

    Quan Si; Hao Yue; Ma Xiao-Hua; Yu Hui-You

    2011-01-01

    AlGaN/GaN depletion-mode high-electron-mobility transistor (D-HEMT) and fluorine (F) plasma treated enhancement-mode high-electron-mobility transistor (E-HEMT) are exposed to 60Co gamma radiation with a dose of 1.6 Mrad (Si). No degradation is observed in the performance of D-HEMT. However, the maximum transconductance of E-HEMT is increased after radiation. The 2DEG density and the mobility are calculated from the results of capacitance-voltage measurement. The electron mobility decreases after fluorine plasma treatment and recovers after radiation. Conductance measurements in a frequency range from 10 kHz to 1 MHz are used to characterize the trapping effects in the devices. A new type of trap is observed in the F plasma treated E-HEMT compared with the D-HEMT, but the density of the trap decreases by radiation. Fitting of Gp/ω data yields the trap densities DT = (1 - 3) × 1012 cm-2-·eV-1 and DT = (0.2 - 0.8) × 1012 cm-2·eV-1 before and after radiation, respectively.The time constant is 0.5 ms-6 ms. With F plasma treatment, the trap is introduced by etch damage and degrades the electronic mobility. After 60Co gamma radiation, the etch damage decreases and the electron mobility is improved. The gamma radiation can recover the etch damage caused by F plasma treatment.

  9. Surface modification of polyester fabrics by atmospheric-pressure air/He plasma for color strength and adhesion enhancement

    Science.gov (United States)

    Zhang, Chunming; Zhao, Meihua; Wang, Libing; Qu, Lijun; Men, Yajing

    2017-04-01

    Surface properties of water-based pigmented inks for ink-jet printed polyester fabrics were modified with atmospheric-pressure air/He plasma to improve the color strength and pigment adhesion of the treated surfaces. The influence of various parameters, including the surface morphology, chemical compositions, surface energy and dynamic contact angles of the control and plasma treated samples was studied. Color strength and edge definition were used to evaluate the ink-jet printing performance of fabrics. The change in pigment adhesion to polyester fibers was analyzed by SEM (scanning electron microscopy). AFM (Atomic force microscope) and XPS (X-ray photoelectron spectroscopy) analyses indicated the increase in surface roughness and the oxygen-containing polar groups(Cdbnd O, Csbnd OH and COOH) reinforced the fixation of pigments on the fiber surface. The result from this study suggested that the improved pigment color yield was clearly affected by alteration of pigment adhesion enhanced by plasma surface modification. Polyester fabrics exhibited better surface property and ink-jet printing performance after the air/He mixture plasma treatment comparing with those after air plasma treatment.

  10. Improvement on Diamond Nucleation Treated by Pulsed Arc Discharge Plasma

    Institute of Scientific and Technical Information of China (English)

    马志斌; 万军; 汪建华; 张文文

    2004-01-01

    A technique of improvement on diamond nucleation based on pulsed arc discharge plasma at atmospheric pressure was developed. The pulsed arc discharge was induced respectively by nitrogen, argon and methanol gas. After the arc plasma pretreatment, a nucleation density higher than 1010 cm-2 may be obtained subsequently in chemical vapor deposition (CVD) on a mirror-polished silicon substrate without any other mechanical treatment. The effects of the arc discharge plasma on the diamond nucleation were investigated by scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), infrared spectroscopy (IR) and Raman spectroscopy. The enhancement of nucleation is postulated to be a result of the formation of carbonlike phase materials or nitrogenation on the substrate surface without surface defect produced by arc discharge.

  11. [Research on enhanced photocatalytic degradation of medical PVC by plasma-initiated free radicals].

    Science.gov (United States)

    Li, Xiao-jing; Qiao, Guan-jun; Chen, Jie-rong

    2007-05-01

    Effects of plasma-initiated free radicals on photocatalytic degradation of medical PVC with anatase TiO2 were studied. Surface properties of PVC were characterized by the contact angle, surface tension, X-ray photoelectron spectroscopy (XPS) and electron spin resonance (ESR). The results indicate that the surface free energy and wettability of plasma-treated PVC increase greatly. The contact angles of distilled water, glycerin and dihydroxyethylsulfide for the plasma-treated PVC decrease. ESR reveals radicals on the surface of the plasma-treated PVC film nearly increase ten times. Moreover, the photodegradation of the PVC-TiO2 was compared with that of plasma-treated PVC-TiO2 through performing weight loss monitoring, scanning electron microscopic (SEM) analysis. Weight-loss rate of the plasma-treated PVC-TiO2 increases 27.4% in comparison with that of PVC-TiO2 under UV irradiation for 60 hours. SEM of the plasma-treated PVC-TiO2 film shows a lot of crack on the surface after photodegradation. Plasma treatments aggravate the photocatalytic degradation of medical PVC.

  12. Fibrinolysis during liver transplantation is enhanced by using solvent/detergent virus-inactivated plasma (ESDEP)

    NARCIS (Netherlands)

    J. de Jonge (Jeroen); T.H.N. Groenland (Theo); H.J. Metselaar (Herold); L.E. Visser (Loes); H.W. Tilanus (Hugo); H.H.D.M. van Vliet (Huib); J.N.M. IJzermans (Jan)

    2002-01-01

    textabstractAfter the introduction of solvent/detergent-treated plasma (ESDEP) in our hospital, an increased incidence of hyperfibrinolysis was observed (75% vs 29%; P = 0.005) compared with the use of fresh frozen plasma for liver transplantation. To clarify this increased inciden

  13. Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma

    Science.gov (United States)

    Han, Jeong Hwan; Lee, Byoung Kook; Jung, Eun Ae; Kim, Hyo-Suk; Kim, Seong Jun; Kim, Chang Gyoun; Chung, Taek-Mo; An, Ki-Seok

    2015-12-01

    Amorphous ZnSnOx (ZTO) films were prepared using plasma-enhanced atomic layer deposition (PEALD) in a temperature range of 100-200 °C. Metal-organic precursors of Sn(dmamp)2 (dmamp = bis(1-dimethylamino-2-methyl-2-propoxide) and diethylzinc were employed as sources of Sn and Zn, respectively, in combination with O2 plasma as a reactant. Sn levels in the ZTO films were controlled by varying the SnO2/ZnO cycle ratio from 0 to 8. According to the growth behaviour of the ZTO film by alternating SnO2 and ZnO PEALD cycles, it was observed that ZnO growth on Sn-rich ZTO film is retarded, whereas SnO2 growth is enhanced on Zn-rich ZTO film. The chemical states of the ZTO films were confirmed by X-ray photoelectron spectroscopy (XPS); the chemical compositions of the ZTO films were characterised by XPS depth profiling. Grazing-angle X-ray diffraction revealed that the PEALD ZTO films possess an amorphous structure, irrespective of Sn levels from 20 to 59 at.%. ZTO films with intermediate Sn at.% exhibited smooth surface morphology compared to binary ZnO and SnO2 films. Additionally, the step coverage of a ZTO film deposited on hole pattern with an aspect ratio of 8 and opening diameter of 110 nm was about 93%, suggesting the realisation of self-limited growth.

  14. Present limitations of CVD diamond detectors for IMRT applications

    Energy Technology Data Exchange (ETDEWEB)

    De Angelis, C. [Dipartimento di Tecnologie e Salute, Istituto Superiore di Sanita and INFN, Viale regina Elena 299, 00161 Rome (Italy)], E-mail: cinzia.deangelis@iss.it; Casati, M. [Dipartimento di Fisiopatologia dell' Universita and INFN, Florence (Italy); Bruzzi, M. [Dipartimento di Energetica dell' Universita and INFN, Florence (Italy); Onori, S. [Dipartimento di Tecnologie e Salute, Istituto Superiore di Sanita and INFN, Viale regina Elena 299, 00161 Rome (Italy); Bucciolini, M. [Dipartimento di Fisiopatologia dell' Universita and INFN, Florence (Italy)

    2007-12-11

    The aim of the work was to test the suitability of chemical vapor deposited (CVD) diamond detectors for dosimetry in IMRT fields. We used in-house CVD detectors prepared with state-of-the-art polycrystalline diamond films (Element Six Ltd., UK). The parameters considered were time stability, dynamic response, dose-rate dependence and energy dependence. Output factors and TPR were measured in conventional photon fields and dose measurements were performed in IMRT fields using the step-and-shoot technique. Results prove that CVD diamond detectors are suitable for dosimetry in conventional treatments, but they still do not fit the IMRT dosimetry requirements, mainly because of their slow dynamic response. In particular, the slow dynamics affects linearity at low Monitor Units and renders it impossible to follow the sharp transients of IMRT fields. Time stability and dose-rate dependence as well must be improved to reduce their influence on dose assessment.

  15. Photoinduced Charge Transfer at Metal Oxide/Oxide Interfaces Prepared with Plasma Enhanced Atomic Layer Deposition

    Science.gov (United States)

    Kaur, Manpuneet

    LiNbO3 and ZnO have shown great potential for photochemical surface reactions and specific photocatalytic processes. However, the efficiency of LiNbO3 is limited due to recombination or back reactions and ZnO exhibits a chemical instability in a liquid cell. In this dissertation, both materials were coated with precise thickness of metal oxide layers to passivate the surfaces and to enhance their photocatalytic efficiency. LiNbO 3 was coated with plasma enhanced atomic layer deposited (PEALD) ZnO and Al2O3, and molecular beam deposited TiO2 and VO2. On the other hand, PEALD ZnO and single crystal ZnO were passivated with PEALD SiO2 and Al2O3. Metal oxide/LiNbO3 heterostructures were immersed in aqueous AgNO3 solutions and illuminated with ultraviolet (UV) light to form Ag nanoparticle patterns. Alternatively, Al2O3 and SiO2/ZnO heterostructures were immersed in K3PO 4 buffer solutions and studied for photoelectrochemical reactions. A fundamental aspect of the heterostructures is the band alignment and band bending, which was deduced from in situ photoemission measurements. This research has provided insight to three aspects of the heterostructures. First, the band alignment at the interface of metal oxides/LiNbO 3, and Al2O3 or SiO2/ZnO were used to explain the possible charge transfer processes and the direction of carrier flow in the heterostructures. Second, the effect of metal oxide coatings on the LiNbO3 with different internal carrier concentrations was related to the surface photochemical reactions. Third is the surface passivation and degradation mechanism of Al2O 3 and SiO2 on ZnO was established. The heterostructures were characterized after stability tests using atomic force microscopy (AFM), scanning electron microscopy (SEM), and cross-section transmission electron microscopy (TEM). The results indicate that limited thicknesses of ZnO or TiO2 on polarity patterned LiNbO3 (PPLN) enhances the Ag+ photoinduced reduction process. ZnO seems more efficient

  16. Fabrication and Characterization of FeNiCr Matrix-TiC Composite for Polishing CVD Diamond Film

    Institute of Scientific and Technical Information of China (English)

    Zhuji Jin; Zewei Yuan; Renke Kang; Boxian Dong

    2009-01-01

    Dynamic friction polishing (DFP) is one of the most promising methods appropriate for polishing CVD diamond film with high efficiency and low cost.By this method CVD diamond film is polished through being simply pressed against a metal disc rotating at a high speed utilizing the thermochemical reaction occurring as a result of dynamic friction between them in the atmosphere.However, the relatively soft materials such as stainless steel, cast iron and nickel alloy widely used for polishing CVD diamond film are easy to wear and adhere to diamond film surface, which may further lead to low efficiency and poor polishing quality.In this paper, FeNiCr matrix-TiC composite used as grinding wheel for polishing CVD diamond film was obtained by combination of mechanical alloying (MA) and spark plasma sintering (SPS).The process of ball milling,composition, density, hardness, high-temperature oxidation resistance and wear resistance of the sintered piece were analyzed.The results show that TiC was introduced in MA-SPS process and had good combination with FeNiCr matrix and even distribution in the matrix.The density of composite can be improved by mechanical alloying.The FeNiCr matrix-TiC composite obtained at 1273 K was found to be superior to at 1173 K sintering in hardness, high-temperature oxidation resistance and wearability.These properties are more favorable than SUS304 for the preparation of high-performance grinding wheel for polishing CVD diamond film.

  17. CVD polymers fabrication of organic surfaces and devices

    CERN Document Server

    Gleason, Karen K

    2015-01-01

    The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insol

  18. Engineered CVD Diamond Coatings for Machining and Tribological Applications

    Science.gov (United States)

    Dumpala, Ravikumar; Chandran, Maneesh; Ramachandra Rao, M. S.

    2015-07-01

    Diamond is an allotropes of carbon and is unique because of its extreme hardness (~100 GPa), low friction coefficient (fracture toughness can be tuned by controlling the grain size of the coatings from a few microns to a few nanometers. In this review, characteristics and performance of the CVD diamond coatings deposited on cemented tungsten carbide (WC-Co) substrates were discussed with an emphasis on WC-Co grade selection, substrate pretreatment, nanocrystallinity and microcrystallinity of the coating, mechanical and tribological characteristics, coating architecture, and interfacial adhesion integrity. Engineered coating substrate architecture is essential for CVD diamond coatings to perform well under harsh and highly abrasive machining and tribological conditions.

  19. Carbon Nanotubes Deposited by Hot Wire Plasma CVD and water assisted CVD for Energetic and Environmental Applications

    OpenAIRE

    2014-01-01

    Nanoscience and Nanotechnology have experienced a tremendous growth in few years. Nanotechnologies are the design, characterization, production and application of structures, devices and systems by controlling shape and size at nanometer scale. Carbon exists in several forms, depending on how the carbon atoms are arranged, their properties vary. One of the carbon forms is carbon nanotubes, which are capped at each end by half of a fullerene, and have aroused great interest in the research com...

  20. IL-6 enhances plasma IL-1ra, IL-10, and cortisol in humans

    DEFF Research Database (Denmark)

    Steensberg, Adam; Fischer, Christian Philip; Keller, Charlotte

    2003-01-01

    The purpose of the present study was to test the hypothesis that a transient increase in plasma IL-6 induces an anti-inflammatory environment in humans. Therefore, young healthy volunteers received a low dose of recombinant human (rh)IL-6 or saline for 3 h. Plasma IL-6 levels during rhIL-6 infusion...... number without effects on plasma epinephrine, body temperature, mean arterial pressure, or heart rate. In conclusion, this study demonstrates that physiological concentrations of IL-6 induce an anti-inflammatory rather than an inflammatory response in humans and that IL-6, independently of TNF......-induced leukocyte trafficking....

  1. Optimally enhanced optical emission in laser-induced air plasma by femtosecond double-pulse

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Anmin [Institute of Atomic and Molecular Physics, Jilin University, Changchun 130012 (China); Institute of Theoretical Chemistry, State Key Laboratory of Theoretical and Computational Chemistry, Jilin University, Changchun 130012 (China); Li, Suyu; Li, Shuchang; Jiang, Yuanfei; Ding, Dajun [Institute of Atomic and Molecular Physics, Jilin University, Changchun 130012 (China); Shao, Junfeng; Wang, Tingfeng [State Key Laboratory of Laser Interaction with Matter, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033 (China); Huang, Xuri [Institute of Theoretical Chemistry, State Key Laboratory of Theoretical and Computational Chemistry, Jilin University, Changchun 130012 (China); Jin, Mingxing [Institute of Atomic and Molecular Physics, Jilin University, Changchun 130012 (China); State Key Laboratory of Laser Interaction with Matter, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033 (China)

    2013-10-15

    In laser-induced breakdown spectroscopy, a femtosecond double-pulse laser was used to induce air plasma. The plasma spectroscopy was observed to lead to significant increase of the intensity and reproducibility of the optical emission signal compared to femtosecond single-pulse laser. In particular, the optical emission intensity can be optimized by adjusting the delay time of femtosecond double-pulse. An appropriate pulse-to-pulse delay was selected, that was typically about 50 ps. This effect can be especially advantageous in the context of femtosecond laser-induced breakdown spectroscopy, plasma channel, and so on.

  2. Enhancement of liquid treatment efficiency by microwave plasma under flow-induced reduced pressure

    Science.gov (United States)

    Ito, Michiko; Takahashi, Tomohiro; Takitou, Sho; Takashima, Seigo; Nomura, Norio; Kitagawa, Tominori; Toyoda, Hirotaka

    2017-02-01

    A new microwave plasma device system for in-line solution treatment is developed. In this system, the Venturi effect for pressure reduction is utilized for stable and effective plasma production. The decomposition of phenol solution is tested to verify the efficiency of an in-line plasma treatment system, and such a treatment system is confirmed to have a higher decomposition efficiency than our previously developed batch-type treatment system. Increases in phenol decomposition speed and decomposition energy efficiency with increasing solution flow rate are observed, which suggests the suppression of OH radical recombination and the utilization of OH radicals under flowing solution conditions.

  3. Label-Free Optical Detection of Acute Myocardial Infarction Based on Blood Plasma Surface-Enhanced Raman Spectroscopy

    Science.gov (United States)

    Chen, Y. X.; Chen, M. W.; Lin, J. Y.; Lai, W. Q.; Huang, W.; Chen, H. Y.; Weng, G. X.

    2016-11-01

    This study is intended to explore the potential of silver (Ag) nanoparticle-based plasma surface-enhanced Raman spectroscopy (SERS) for providing a rapid and simple "Yes/No" assessment to detect acute myocardial infarction (AMI). A simple, rapid, and accurate method of diagnosing AMI is critical to reduce mortality and improve prognosis. Techniques such as electrocardiography examination and use of cardiac troponins have not yet met the current clinical need. Therefore, alternative approaches need to be developed. Plasma samples from 32 patients with AMI and 32 healthy control (Clt) subjects were assessed. Multivariate statistical techniques, including principal component (PC) analysis and linear discriminant analysis (PCA-LDA), were employed to develop a diagnostic algorithm for differentiating between patients with AMI and Clt subjects. Furthermore, the receiver operating characteristic was tested to evaluate the performance of the PCA-LDA algorithm for AMI detection. Each plasma sample was mixed with an equal volume of Ag colloidal solution, and the SERS measurement of each plasma sample was performed. The plasma SERS spectrum showed much stronger and sharper peaks compared with the normal Raman spectrum. Tentative assignments of Raman spectroscopy bands showed specific biomolecular (e.g., proteins, adenosine, adenine, and uric acid) changes. PC analysis and LDA were employed to discriminate patients with AMI from Clt subjects, yielding a sensitivity of 87.5% and a specificity of 93.8%. The findings of this study suggest that plasma SERS has a great potential for improving AMI in the future, and this will certainly reduce the difficulty, time to draw blood, and patients' pain to a great extent.

  4. Achieving enhanced DSSC performance by microwave plasma incorporation of carbon into TiO2 photoelectrodes

    OpenAIRE

    Dang, Binh H.Q.; MacElroy, J. M. Don; Dowling, Denis P.

    2013-01-01

    The photoactivity of carbon-incorporated titanium dioxide (TiO2) has been widely reported. This study involves a novel approach to the incorporation of carbon into TiO2 through the use of microwave plasma processing. The process involved thermally treating printed TiO2 nanoparticle coatings in a microwave-induced argon-oxygen plasma containing low concentrations of methane. The resulting deposited carbon layer was characterized using XRD, XPS, Raman, UV–vis, ellipsometry, and optical profilom...

  5. Comment on "Large enhancement in high-energy photoionization of Fe XVII and missing continuum plasma opacity"

    CERN Document Server

    Blancard, C; Cossé, Ph; Faussurier, G; Fontes, C J; Gilleron, F; Golovkin, I; Hansen, S B; Iglesias, C A; Kilcrease, D P; MacFarlane, J J; More, R M; Pain, J -C; Sherrill, M; Wilson, B G

    2016-01-01

    Recent R-matrix calculations claim to produce a significant enhancement in the opacity of Fe XVII due to atomic core excitations [S. N. Nahar & A.K. Pradhan, Phys. Rev. Letters 116, 235003 (2016), arXiv:1606.02731] and assert that this enhancement is consistent with recent measurements of higher-than-predicted iron opacities [J. E. Bailey et al., Nature 517, 56 (2015)]. This comment shows that the standard opacity models which have already been directly compared with experimental data produce photon absorption cross-sections for Fe XVII that are effectively equivalent to (and in fact larger than) the new R-matrix opacities. Thus, the new R-matrix results cannot be expected to significantly impact the existing discrepancies between theory and experiment because they produce neither a "large enhancement" nor account for "missing continuum plasma opacity" relative to standard models.

  6. Thermal and plasma enhanced atomic layer deposition of SiO{sub 2} using commercial silicon precursors

    Energy Technology Data Exchange (ETDEWEB)

    Putkonen, Matti, E-mail: matti.putkonen@vtt.fi [VTT Technical Research Centre of Finland, P.O. Box 1000, FI-02044, Espoo (Finland); Laboratory of Inorganic Chemistry, Aalto University School of Chemical Technology, P.O. Box 16100, FI-00076, Espoo (Finland); Bosund, Markus [Beneq Oy, Ensimmäinen savu, FI-01510, Vantaa (Finland); Ylivaara, Oili M.E.; Puurunen, Riikka L.; Kilpi, Lauri; Ronkainen, Helena [VTT Technical Research Centre of Finland, P.O. Box 1000, FI-02044, Espoo (Finland); Sintonen, Sakari; Ali, Saima; Lipsanen, Harri [Aalto University School of Electrical Engineering, Department of Micro- and Nanosciences, P.O. Box 13500, FI-00076 Espoo (Finland); Liu, Xuwen; Haimi, Eero; Hannula, Simo-Pekka [Aalto University School of Chemical Technology, Department of Materials Science and Engineering, P.O. Box 16200, FI-00076 Espoo (Finland); Sajavaara, Timo [University of Jyväskylä, Department of Physics, P.O. Box 35, FI-40014 Jyväskylä (Finland); Buchanan, Iain; Karwacki, Eugene [Air Products and Chemicals Inc., 7201 Hamilton Blvd., Allentown, PA 18195 (United States); Vähä-Nissi, Mika [VTT Technical Research Centre of Finland, P.O. Box 1000, FI-02044, Espoo (Finland)

    2014-05-02

    In this paper, we report ALD deposition of silicon dioxide using either thermal or plasma enhanced atomic layer deposition (PEALD). Several aminosilanes with differing structures and reactivity were used as silicon precursors in R and D single wafer ALD tools. One of the precursors was also tested on pilot scale batch ALD using O{sub 3} as oxidant and with substrates measuring 150 × 400 mm. The SiO{sub 2} film deposition rate was greatly dependent on the precursors used, highest values being 1.5–2.0 Å/cycle at 30–200 °C for one precursor with an O{sub 2} plasma. According to time-of-flight-elastic recoil detection analysis measurements carbon and nitrogen impurities were relatively low, but hydrogen content increased at low deposition temperatures. - Highlights: • SiO{sub 2} thin film is deposited by thermal and plasma enhanced atomic layer deposition (PEALD). • We report low-temperature deposition of SiO{sub 2} even at 30 °C by PEALD. • Scaling up of the atomic layer deposition processes to industrial batch is reported. • Deposited films had low low compressive residual stress and good conformality.

  7. Enhanced active aluminum content and thermal behaviour of nano-aluminum particles passivated during synthesis using thermal plasma route

    Energy Technology Data Exchange (ETDEWEB)

    Mathe, Vikas L., E-mail: vlmathe@physics.unipune.ac.in [Department of Physics, Savitribai Phule Pune University, Pune 411007, Maharashtra (India); Varma, Vijay; Raut, Suyog [Department of Physics, Savitribai Phule Pune University, Pune 411007, Maharashtra (India); Nandi, Amiya Kumar; Pant, Arti; Prasanth, Hima; Pandey, R.K. [High Energy Materials Research Lab, Sutarwadi, Pune 411021, Maharashtra (India); Bhoraskar, Sudha V. [Department of Physics, Savitribai Phule Pune University, Pune 411007, Maharashtra (India); Das, Asoka K. [Utkal University, VaniVihar, Bhubaneswar, Odisha 751004 (India)

    2016-04-15

    Graphical abstract: - Highlights: • Synthesis of nano crystalline Al (nAl) using DC thermal plasma reactor. • In situ passivation of nAl by palmitic acid and air. • Enhanced active aluminum content obtained for palmitic acid passivated nAl. • Palmitic acid passivated nAl are quite stable in humid atmospheres. - Abstract: Here, we report synthesis and in situ passivation of aluminum nanoparticles using thermal plasma reactor. Both air and palmitc acid passivation was carried out during the synthesis in the thermal plasma reactor. The passivated nanoparticles have been characterized for their structural and morphological properties using X-ray diffraction (XRD) and transmission electron microscopy (TEM) techniques. In order to understand nature of passivation vibrational spectroscopic analysis have been carried out. The enhancement in active aluminum content and shelf life for a palmitic acid passivated nano-aluminum particles in comparison to the air passivated samples and commercially available nano Al powder (ALEX) has been observed. Thermo-gravimetric analysis was used to estimate active aluminum content of all the samples under investigation. In addition cerimetric back titration method was also used to estimate AAC and the shelf life of passivated aluminum particles. Structural, microstructural and thermogravomateric analysis of four year aged passivated sample also depicts effectiveness of palmitic acid passivation.

  8. Fabrication of metallic single electron transistors featuring plasma enhanced atomic layer deposition of tunnel barriers

    Science.gov (United States)

    Karbasian, Golnaz

    The continuing increase of the device density in integrated circuits (ICs) gives rise to the high level of power that is dissipated per unit area and consequently a high temperature in the circuits. Since temperature affects the performance and reliability of the circuits, minimization of the energy consumption in logic devices is now the center of attention. According to the International Technology Roadmaps for Semiconductors (ITRS), single electron transistors (SETs) hold the promise of achieving the lowest power of any known logic device, as low as 1x10-18 J per switching event. Moreover, SETs are the most sensitive electrometers to date, and are capable of detecting a fraction of an electron charge. Despite their low power consumption and high sensitivity for charge detection, room temperature operation of these devices is quite challenging mainly due to lithographical constraints in fabricating structures with the required dimensions of less than 10 nm. Silicon based SETs have been reported to operate at room temperature. However, they all suffer from significant variation in batch-to-batch performance, low fabrication yield, and temperature-dependent tunnel barrier height. In this project, we explored the fabrication of SETs featuring metal-insulator-metal (MIM) tunnel junctions. While Si-based SETs suffer from undesirable effect of dopants that result in irregularities in the device behavior, in metal-based SETs the device components (tunnel barrier, island, and the leads) are well-defined. Therefore, metal SETs are potentially more predictable in behavior, making them easier to incorporate into circuits, and easier to check against theoretical models. Here, the proposed fabrication method takes advantage of unique properties of chemical mechanical polishing (CMP) and plasma enhanced atomic layer deposition (PEALD). Chemical mechanical polishing provides a path for tuning the dimensions of the tunnel junctions, surpassing the limits imposed by electron beam

  9. Influence of ignition condition on the growth of silicon thin films using plasma enhanced chemical vapour deposition

    Institute of Scientific and Technical Information of China (English)

    Zhang Hai-Long; Liu Feng-Zhen; Zhu Mei-Fang; Liu Jin-Long

    2012-01-01

    The influences of the plasma ignition condition in plasma enhanced chemical vapour deposition (PECVD) on the interfaces and the microstructures of hydrogenated microcrystalline Si (μc-Si:H) thin films are investigated.The plasma ignition condition is modified by varying the ratio of SiH4 to H2 (RH).For plasma ignited with a constant gas ratio,the time-resolved optical emission spectroscopy presents a low value of the emission intensity ratio of Hα to SiH(IHα/IsiH) at the initial stage,which leads to a thick amorphous incubation layer.For the ignition condition with a profiling RH,the higher IHα/IsiH values are realized.By optimizing the RH modulation,a uniform crystallinity along the growth direction and a denser μc-Si:H film can be obtained.However,an excessively high IHα/IsiH* may damage the interface properties,which is indicated by capacitance-voltage (C-V) measurements.Well controlling the ignition condition is critically important for the applications of Si thin films.

  10. Highly Uniform Wafer-scale Synthesis of α-MoOsub>3sub> by Plasma Enhanced Chemical Vapor Deposition.

    Science.gov (United States)

    Kim, HyeongU; Son, Juhyun; Kulkarni, Atul; Ahn, Chisung; Kim, Ki Seok; Shin, Dongjoo; Yeom, Geun; Kim, Taesung

    2017-03-20

    Molybdenum oxide (MoOsub>3sub>) has gained immense attention because of its high electron mobility, wide band gap, and excellent optical and catalytic properties. However, the synthesis of uniform and large-area MoOsub>3sub> is challenging. Here, we report the synthesis of wafer-scale α-MoO3 by plasma oxidation of Mo-deposited on Si/SiOsub>2sub>. Mo was oxidized by Osub>2sub> plasma in a plasma enhanced chemical vapor deposition (PECVD) system at 150 °C. Mo was oxidized by Osub>2sub> plasma in a PECVD system at 150 °C. It was found that the synthesized α-MoOsub>3sub> had a highly uniform crystalline structure. For the as-synthesized α-MoOsub>3sub> sensor, we observed a current change when the relative humidity was increased from 11% to 95%. The sensor was exposed to different humidity levels with fast recovery time of about 8 s. Hence this feasibility study shows that MoOsub>3sub> synthesized at low temperature can be utilized for the gas sensing applications by adopting flexible device technology.

  11. Enhancement of hydrogen isotope retention capacity for the impurity deposited tungsten by long-term plasma exposure in LHD

    Energy Technology Data Exchange (ETDEWEB)

    Oya, Yasuhisa, E-mail: syoya@ipc.shizuoka.ac.jp [Radioscience Research Laboratory, Faculty of Science, Shizuoka University, Shizuoka 422-8529 (Japan); Masuzaki, Suguru; Tokitani, Masayuki [National Institute for Fusion Science, Gifu 509-5292 (Japan); Yoshida, Naoaki; Watanabe, Hideo [Kyushu University, Fukuoka 816-8580 (Japan); Yamauchi, Yuji; Hino, Tomoaki [Hokkaido University, Sapporo 060-8628 (Japan); Miyamoto, Mitsutaka [Shimane University, Shimane 690-8504 (Japan); Hatano, Yuji [University of Toyama, Toyama 930-8555 (Japan); Okuno, Kenji [Radioscience Research Laboratory, Faculty of Science, Shizuoka University, Shizuoka 422-8529 (Japan)

    2013-10-15

    Highlights: • The carbon-dominant mixed-material layer was formed on the tungsten surface after 15{sup th} plasma exposure in LHD. • The largest enhancement of deuterium retention was found to be about 21. • The major deuterium desorption temperature was shifted toward higher temperature side. -- Abstract: The stress relieved tungsten samples were placed at three positions, PI (sputtering erosion dominated area), DP (deposition dominated area) and HL (Higher heat load area) during 15th plasma experiment campaign in Large Helical Device (LHD) at National Institute for Fusion Science (NIFS), Japan and were exposed to ∼ 6700 shots of hydrogen plasma in a 15th long-term experiment campaign in LHD. Thereafter, the additional deuterium ion implantation to these tungsten samples was performed to evaluate the change of hydrogen isotope retention capacity in the samples by long-term plasma exposure. It was found that the carbon-dominant mixed-material layer with more than 100 nm thickness was formed on a wide area of the tungsten surface. The thicker mixed-material layer was formed on the DP sample, where the deuterium retention was about 21 times as high as that for pure W. The major desorption temperature of deuterium was shifted toward higher temperature side, which was comparable to the trapping characteristic of carbon or irradiation damages.

  12. Plasma-treated polystyrene film that enhances binding efficiency for sensitive and label-free protein biosensing

    Science.gov (United States)

    Guo, Bihong; Li, Shaopeng; Song, Lusheng; Yang, Mo; Zhou, Wenfei; Tyagi, Deependra; Zhu, Jinsong

    2015-08-01

    A plasma-treated ultrathin polystyrene (PS) film surface was explored as a simple, robust, and low-cost surface chemistry solution for protein biosensing applications. This surface could dramatically improve the binding efficiency of the protein-protein interactions, which is defined as the binding signal per immobilized ligand. The PS-modified protein biosensor was readily fabricated by spin coating and plasma treatment. Various parameters for fabrication, including the concentration of the PS solution, rate of spin coating, and duration of plasma treatment, were systematically optimized based on the improvement of fluorescence signal yielded by the microfluidic network-aided fluorescence immunoassay. The performance of the label-free protein detection on the optimized surfaces was further evaluated by surface plasmon resonance imaging (SPRi). PS surfaces with optimal fabrication parameters exhibited up to an 620% enhancement of the protein binding response and approximately 210% of the protein binding per immobilized protein ligand compared with a self-assembled monolayer (SAM) surface of 11-mercapto undecanoic acid (MUA). The relationship between the fabrication parameters used and changes to the surface chemistry and the morphological properties were characterized with atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and Fourier transform infrared spectroscopy (FTIR). It was revealed that the morphological changes observed in the plasma-treated PS film were the dominant factor for the improvement of the protein bioassay performance, rather than the chemical changes.

  13. Formation of oxygen vacancies and Ti3+ state in TiO2 thin film and enhanced optical properties by air plasma treatment

    OpenAIRE

    Bandna Bharti; Santosh Kumar; Heung-No Lee; Rajesh Kumar

    2016-01-01

    This is the first time we report that simply air plasma treatment can also enhances the optical absorbance and absorption region of titanium oxide (TiO2) films, while keeping them transparent. TiO2 thin films having moderate doping of Fe and Co exhibit significant enhancement in the aforementioned optical properties upon air plasma treatment. The moderate doping could facilitate the formation of charge trap centers or avoid the formation of charge recombination centers. Variation in surface s...

  14. Atmospheric pressure CVD of SNO2 and ZNO:AL

    NARCIS (Netherlands)

    Deelen, J. van; Kniknie, B.J.; Steijvers, H.L.A.H.; Mannie, G.; Thune, P.; Illiberi, A.

    2012-01-01

    Atmospheric pressure CVD (APCVD) is a highly cost effective method of depositing transparent conductive oxides (TCOs). In this work, insights in alcohol addition in the widely applied SnO2 process are discussed, including high resolution TEM images. Furthermore, the APCVD process of ZnO:Al was demon

  15. High rate deposition of microcrystalline silicon films by high-pressure radio frequency plasma enhanced chemical vapor deposition (PECVD)

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    Hydrogenated microcrystalline silicon (μc-Si:H) thin films were prepared by high- pressure radio-frequency (13.56 MHz) plasma enhanced chemical vapor deposition (rf-PECVD) with a screened plasma. The deposition rate and crystallinity varying with the deposition pressure, rf power, hydrogen dilution ratio and electrodes distance were systematically studied. By optimizing the deposition parameters the device quality μc-Si:H films have been achieved with a high deposition rate of 7.8 /s at a high pressure. The Voc of 560 mV and the FF of 0.70 have been achieved for a single-junction μc-Si:H p-i-n solar cell at a deposition rate of 7.8 /s.

  16. Enhanced active aluminum content and thermal behaviour of nano-aluminum particles passivated during synthesis using thermal plasma route

    Science.gov (United States)

    Mathe, Vikas L.; Varma, Vijay; Raut, Suyog; Nandi, Amiya Kumar; Pant, Arti; Prasanth, Hima; Pandey, R. K.; Bhoraskar, Sudha V.; Das, Asoka K.

    2016-04-01

    Here, we report synthesis and in situ passivation of aluminum nanoparticles using thermal plasma reactor. Both air and palmitc acid passivation was carried out during the synthesis in the thermal plasma reactor. The passivated nanoparticles have been characterized for their structural and morphological properties using X-ray diffraction (XRD) and transmission electron microscopy (TEM) techniques. In order to understand nature of passivation vibrational spectroscopic analysis have been carried out. The enhancement in active aluminum content and shelf life for a palmitic acid passivated nano-aluminum particles in comparison to the air passivated samples and commercially available nano Al powder (ALEX) has been observed. Thermo-gravimetric analysis was used to estimate active aluminum content of all the samples under investigation. In addition cerimetric back titration method was also used to estimate AAC and the shelf life of passivated aluminum particles. Structural, microstructural and thermogravomateric analysis of four year aged passivated sample also depicts effectiveness of palmitic acid passivation.

  17. Growth of carbon nanofibers in plasma-enhanced chemical vapor deposition

    Science.gov (United States)

    Denysenko, Igor; Ostrikov, Kostya; Tam, Eugene

    2008-10-01

    A theoretical model describing the plasma-assisted growth of carbon nanofibers with metal catalyst particles on top is proposed. Using the model, the plasma-related effects on the nanofiber growth parameters such us the surface diffusion growth rate, the effective carbon flux to the catalyst surface, the characteristic residence time and diffusion length of carbon on the catalyst surface, and the surface coverages, have been studied. It has been found how these parameters depend on the catalyst surface temperature and ion and etching gas fluxes to the catalyst surface. The optimum conditions under which a low-temperature plasma environment can benefit the carbon nanofiber growth are formulated. It has been also found how the plasma environment affects the temperature distribution over the length of the carbon nanofibers. Conditions when the temperature of the catalyst nanoparticles is higher than the temperature of the substrate holder are determined. The results here are in a good agreement with the available experimental data on the carbon nanofiber growth and can be used for optimizing synthesis of nanoassemblies in low-temperature plasma-assisted nanofabrication.

  18. Enhancement of Polytechnic University of Puerto Rico's plasma machine cooling system

    Energy Technology Data Exchange (ETDEWEB)

    Leal-Escalante, D; Colmenares, F; Gonzalez-Lizardo, A; Leal-Quiros, E [Plasma Engineering Laboratory, Polytechnic University of Puerto Rico, San Juan, PR 00918 (Puerto Rico)

    2008-10-15

    The Mirror and Cusp Plasma Machine at the Polytechnic University of Puerto Rico is a unique research and development machine to create plasma. Due to the high current, high magnetic field confinement and large chamber capacity, this machine is the only plasma machine in the Caribbean to reach high plasma temperatures and densities. Certainly these parameters are achieved by a high dc power supply that produces high currents in order to create a fine magnetic field; these currents range from 300 to 800 A, and the heat dissipation created by this process limits the use of the machine. Originally the machine had a water cooling line to circulate water at room temperature, but this line was not cool enough to efficiently remove heat from the system for large periods of time. Also, the high vacuum diffusion pumps used are water-cooled. The present study was developed to design a more efficient cooling system for the Plasma Laboratory using a water-cooled chiller; the main goals are to operate at lower temperatures but at stable currents I> 600 A, and to recycle the water. Now the machine can operate for longer periods of time and on a daily basis, resulting in more efficient experiments and investigations.

  19. Experiments and PIC simulations on liquid crystal plasma mirrors for pulse contrast enhancement

    Science.gov (United States)

    Cochran, G. E.; Poole, P. L.; Krygier, A.; Foster, P. S.; Scott, G. G.; Wilson, L. A.; Bailey, J.; Bourgeois, N.; Hernandez-Gomez, C.; Heery, R.; Purcell, J.; Neely, D.; Rajeev, P. P.; Freeman, R. R.; Schumacher, D. W.

    2016-10-01

    High pulse contrast is crucial for performing many experiments on high intensity lasers in order to minimize modification of the target surface by pre-pulse. This is often achieved through the use of solid dielectric plasma mirrors which can limit laser shot rates. Liquid crystal films, originally developed as variable thickness ion acceleration targets, have been demonstrated as effective plasma mirrors for pulse cleaning, reaching peak reflectivities over 70%. These films were used as plasma mirrors in an ion acceleration experiment on the Scarlet laser and the resultant increase in peak proton energy and change in acceleration direction will be discussed. Also presented here are novel 2D3V, LSP particle-in-cell simulations of dielectric plasma mirror operation. By including multiphoton ionization and dimensionality corrections, an excellent match to experiment is obtained over 4 decades in intensity. Analysis of pulse shortening and plasma critical surface behavior in these simulations will be discussed. Formation of thin films at 1.5 Hz will also be presented. Performed with support from the DARPA PULSE program through AMRDEC, from NNSA, and from OSC.

  20. Effect of substrate bias on deposition behaviour of charged silicon nanoparticles in ICP-CVD process

    Science.gov (United States)

    Yoo, Seung-Wan; You, Shin-Jae; Kim, Jung-Hyung; Seong, Dae-Jin; Seo, Byong-Hoon; Hwang, Nong-Moon

    2017-01-01

    The effect of a substrate bias on the deposition behaviour of crystalline silicon films during inductively coupled plasma chemical vapour deposition (ICP-CVD) was analysed by consideration of non-classical crystallization, in which the building block is a nanoparticle rather than an individual atom or molecule. The coexistence of positively and negatively charged nanoparticles in the plasma and their role in Si film deposition are confirmed by applying bias voltages to the substrate, which is sufficiently small as not to affect the plasma potential. The sizes of positively and negatively charged nanoparticles captured on a carbon membrane and imaged using TEM are, respectively, 2.7-5.5 nm and 6-13 nm. The film deposited by positively charged nanoparticles has a typical columnar structure. In contrast, the film deposited by negatively charged nanoparticles has a structure like a powdery compact with the deposition rate about three times higher than that for positively charged nanoparticles. All the films exhibit crystallinity even though the substrate is at room temperature, which is attributed to the deposition of crystalline nanoparticles formed in the plasma. The film deposited by negatively charged nanoparticles has the highest crystalline fraction of 0.84.

  1. Plasma surface alloying of titanium alloy for enhancing burn-resistant property

    Institute of Scientific and Technical Information of China (English)

    ZHANG Ping-ze; XU Zhong; ZHANG Gao-hui; HE Zhi-yong; YAO Zheng-jun

    2006-01-01

    Conventional titanium alloy may be ignited and burnt under high temperature, high pressure and high gas flow velocity condition. In order to avoid this problem, burn-resistant alloying layers were made on the surface of Ti-6Al-4V and Ti-6.5Al-0.3Mo-1.5Zr-0.25Si titanium alloys by using double glow plasma surface alloying technology (DG Technology). Two typical burn-resistant layers Ti-Cr and Ti-Mo were made by DG plasma chromizing and DG plasma molybdenizing, respectively. Burn-resistant properties were tested by layer ignition method using 2 kW laser machine. Ignition experiments result reveals that the ignition temperature of alloyed layer with Mo and Cr concentration above 10% is about 200℃ higher than ignition temperature of Ti-6Al-4V substrate.

  2. Plasma treated polyethylene grafted with adhesive molecules for enhanced adhesion and growth of fibroblasts.

    Science.gov (United States)

    Rimpelová, Silvie; Kasálková, Nikola Slepičková; Slepička, Petr; Lemerová, Helena; Švorčík, Václav; Ruml, Tomáš

    2013-04-01

    The cell-material interface plays a crucial role in the interaction of cells with synthetic materials for biomedical use. The application of plasma for tailoring polymer surfaces is of abiding interest and holds a great promise in biomedicine. In this paper, we describe polyethylene (PE) surface tuning by Ar plasma irradiating and subsequent grafting of the chemically active PE surface with adhesive proteins or motives to support cell attachment. These simple modifications resulted in changed polymer surface hydrophilicity, roughness and morphology, which we thoroughly characterized. The effect of our modifications on adhesion and growth was tested in vitro using mouse embryonic fibroblasts (NIH 3T3 cell line). We demonstrate that the plasma treatment of PE had a positive effect on the adhesion, spreading, homogeneity of distribution and moderately on proliferation activity of NIH 3T3 cells. This effect was even more pronounced on PE coated with biomolecules.

  3. Enhanced electron yield from a laser-plasma accelerator using high-Z gas jet targets

    CERN Document Server

    Mirzaie, Mohammad; Li, Song; Sokollik, Thomas; He, Fei; Cheng, Ya; Sheng, Zhengming; Zhang, Jie

    2014-01-01

    An investigation of the multi-hundred MeV electron beam yield (charge) form helium, nitrogen, neon and argon gas jet plasmas in a laser-plasma wakefield acceleration experiment was carried out. The charge measurement has been made via imaging the electron beam intensity profile on a fluorescent screen into a 14-bit charge coupled device (CCD) which was cross-calibrated with nondestructive electronics-based method. Within given laser and plasma parameters, we found that laser-driven low Z- gas jet targets generate high-quality and well-collimated electron beams with reasonable yields at the level of 10-100 pC. On the other hand, filamentary electron beams which were observed from high-Z gas jets at higher densities reached much higher yield. Evidences for cluster formation were clearly observed in high-Z gases, especially in the argon gas jet target where we received the highest yield of ~ 3 nC

  4. Enhancement of ZnO-Based Photocatalyst Activity by RF Discharge-Plasma Treatment*

    Science.gov (United States)

    Savastenko, N. A.; Filatov, I. I.; Lyushkevich, V. A.; Chubrik, N. I.; Gabdullin, M. T.; Ramazanov, T. S.; Abdullin, H. A.; Kalkozova, V. A.

    2016-11-01

    The structure and photocatalytic properties of polydisperse zinc oxide (ZnO) powder treated with a low-pressure radio-frequency (RF) plasma discharge were studied. The photocatalytic properties of ZnO before and after the treatment were studied with respect to photodegradation of organic impurities using decomposition of methyl orange in aqueous solution by UV light as an example. It was found that the photodegradation kinetics were described well by first-order equations. The photodegradation mechanisms of methyl orange over untreated and plasma-treated ZnO samples were different. It was shown that the effectiveness of the photodegradation expressed in terms of reaction constants increased by 20% after RF discharge-plasma treatment of the photocatalyst.

  5. Enhanced adherence of mouse fibroblast and vascular cells to plasma modified polyethylene

    Energy Technology Data Exchange (ETDEWEB)

    Reznickova, Alena, E-mail: alena.reznickova@vscht.cz [Department of Solid State Engineering, Institute of Chemical Technology Prague, 166 28 Prague 6 (Czech Republic); Novotna, Zdenka, E-mail: zdenka1.novotna@vscht.cz [Department of Solid State Engineering, Institute of Chemical Technology Prague, 166 28 Prague 6 (Czech Republic); Kolska, Zdenka [Faculty of Science, J.E. Purkyně University, 400 96 Usti nad Labem (Czech Republic); Kasalkova, Nikola Slepickova [Department of Solid State Engineering, Institute of Chemical Technology Prague, 166 28 Prague 6 (Czech Republic); Rimpelova, Silvie [Department of Biochemistry and Microbiology, Institute of Chemical Technology Prague, 166 28 Prague 6 (Czech Republic); Svorcik, Vaclav [Department of Solid State Engineering, Institute of Chemical Technology Prague, 166 28 Prague 6 (Czech Republic)

    2015-07-01

    Since the last decade, tissue engineering has shown a sensational promise in providing more viable alternatives to surgical procedures for harvested tissues, implants and prostheses. Biomedical polymers, such as low-density polyethylene (LDPE), high-density polyethylene (HDPE) and ultra-high molecular weight polyethylene (UHMWPE), were activated by Ar plasma discharge. Degradation of polymer chains was examined by determination of the thickness of ablated layer. The amount of an ablated polymer layer was measured by gravimetry. Contact angle, measured by goniometry, was studied as a function of plasma exposure and post-exposure aging times. Chemical structure of modified polymers was characterized by angle resolved X-ray photoelectron spectroscopy. Surface chemistry and polarity of the samples were investigated by electrokinetic analysis. Changes in surface morphology were followed using atomic force microscopy. Cytocompatibility of plasma activated polyethylene foils was studied using two distinct model cell lines; VSMCs (vascular smooth muscle cells) as a model for vascular graft testing and connective tissue cells L929 (mouse fibroblasts) approved for standardized material cytotoxicity testing. Specifically, the cell number, morphology, and metabolic activity of the adhered and proliferated cells on the polyethylene matrices were studied in vitro. It was found that the plasma treatment caused ablation of the polymers, resulting in dramatic changes in their surface morphology and roughness. ARXPS and electrokinetic measurements revealed oxidation of the polymer surface. It was found that plasma activation has a positive effect on the adhesion and proliferation of VSMCs and L929 cells. - Highlights: • Plasma activation of LDPE, HDPE and UHMWPE • Study of surface properties by several techniques: ARXPS, AFM, zeta-potential, and goniometry • Investigation of adhesion and spreading of vascular smooth muscle cells (VSMCs) and mouse fibroblasts (L929)

  6. Plasma treatment induces internal surface modifications of electrospun poly(L-lactic) acid scaffold to enhance protein coating

    Energy Technology Data Exchange (ETDEWEB)

    Jin Seo, Hyok; Hee Lee, Mi; Kwon, Byeong-Ju; Kim, Hye-Lee; Park, Jong-Chul [Cellbiocontrol Laboratory, Department of Medical Engineering, Yonsei University College of Medicine, Seoul 120-752 (Korea, Republic of); Brain Korea 21 Project for Medical Science, Yonsei University College of Medicine, Seoul 120-752 (Korea, Republic of); Jin Lee, Seung [Department of Industrial Pharmacy, College of Pharmacy, Ewha Womans University, Seoul 120-750 (Korea, Republic of); Kim, Bong-Jin; Wang, Kang-Kyun; Kim, Yong-Rok [Department of Chemistry, Yonsei University, 50 Yonsei-ro, Seodaemun-Gu, Seoul 120-749 (Korea, Republic of)

    2013-08-21

    Advanced biomaterials should also be bioactive with regard to desirable cellular responses, such as selective protein adsorption and cell attachment, proliferation, and differentiation. To enhance cell-material interactions, surface modifications have commonly been performed. Among the various surface modification approaches, atmospheric pressure glow discharge plasma has been used to change a hydrophobic polymer surface to a hydrophilic surface. Poly(L-lactic acid) (PLLA)-derived scaffolds lack cell recognition signals and the hydrophobic nature of PLLA hinders cell seeding. To make PLLA surfaces more conducive to cell attachment and spreading, surface modifications may be used to create cell-biomaterial interfaces that elicit controlled cell adhesion and maintain differentiated phenotypes. In this study, (He) gaseous atmospheric plasma glow discharge was used to change the characteristics of a 3D-type polymeric scaffold from hydrophobic to hydrophilic on both the outer and inner surfaces of the scaffold and the penetration efficiency with fibronectin was investigated. Field-emission scanning electron microscope images showed that some grooves were formed on the PLLA fibers after plasma treatment. X-ray photoelectron spectroscopy data also showed chemical changes in the PLLA structure. After plasma treatment, -CN (285.76 eV) was increased in C1s and -NH{sub 2} (399.70 eV) was increased significantly and –N=CH (400.80 eV) and –NH{sub 3}{sup +} (402.05 eV) were newly appeared in N1s. These changes allowed fibronectin to penetrate into the PLLA scaffold; this could be observed by confocal microscopy. In conclusion, helium atmospheric pressure plasma treatment was effective in modifying the polymeric scaffold, making it hydrophilic, and this treatment can also be used in tissue engineering research as needed to make polymers hydrophilic.

  7. Plasma-treated polystyrene film that enhances binding efficiency for sensitive and label-free protein biosensing

    Energy Technology Data Exchange (ETDEWEB)

    Guo, Bihong [National Center for NanoScience and Technology, No. 11 Beiyitiao, Zhongguancun, Beijing 100190 (China); Li, Shaopeng [National Center for NanoScience and Technology, No. 11 Beiyitiao, Zhongguancun, Beijing 100190 (China); Department of Chemistry, Tsinghua University, Beijing 100084 (China); Song, Lusheng [National Center for NanoScience and Technology, No. 11 Beiyitiao, Zhongguancun, Beijing 100190 (China); Yang, Mo; Zhou, Wenfei; Tyagi, Deependra [National Center for NanoScience and Technology, No. 11 Beiyitiao, Zhongguancun, Beijing 100190 (China); University of Chinese Academy of Sciences, Yuquan Rd., 19(A), Beijing 100049 (China); Zhu, Jinsong, E-mail: jizhu88@gmail.com [National Center for NanoScience and Technology, No. 11 Beiyitiao, Zhongguancun, Beijing 100190 (China)

    2015-08-01

    Highlights: • A simple and robust plasma-treated ultrathin polystyrene film surface was developed for protein biosensing. • The surface was optimized by evaluating up to 120 types of fabrication parameters with high-throughput analytical methods. • The optimized surface showed a 620% improvement of the protein detection signal and 210% protein binding per immobilized protein ligand compared with a self-assembled monolayer surface. - Abstract: A plasma-treated ultrathin polystyrene (PS) film surface was explored as a simple, robust, and low-cost surface chemistry solution for protein biosensing applications. This surface could dramatically improve the binding efficiency of the protein–protein interactions, which is defined as the binding signal per immobilized ligand. The PS-modified protein biosensor was readily fabricated by spin coating and plasma treatment. Various parameters for fabrication, including the concentration of the PS solution, rate of spin coating, and duration of plasma treatment, were systematically optimized based on the improvement of fluorescence signal yielded by the microfluidic network-aided fluorescence immunoassay. The performance of the label-free protein detection on the optimized surfaces was further evaluated by surface plasmon resonance imaging (SPRi). PS surfaces with optimal fabrication parameters exhibited up to an 620% enhancement of the protein binding response and approximately 210% of the protein binding per immobilized protein ligand compared with a self-assembled monolayer (SAM) surface of 11-mercapto undecanoic acid (MUA). The relationship between the fabrication parameters used and changes to the surface chemistry and the morphological properties were characterized with atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and Fourier transform infrared spectroscopy (FTIR). It was revealed that the morphological changes observed in the plasma-treated PS film were the dominant factor for the

  8. Enhanced adhesion over aluminum solid substrates by controlled atmospheric plasma deposition of amine-rich primers.

    Science.gov (United States)

    Petersen, Julien; Fouquet, Thierry; Michel, Marc; Toniazzo, Valérie; Dinia, Aziz; Ruch, David; Bomfim, João A S

    2012-02-01

    Controlled chemical modification of aluminum surface is carried by atmospheric plasma polymerization of allylamine. The amine-rich coatings are characterized and tested for their behavior as adhesion promoter. The adhesion strength of aluminum-epoxy assemblies is shown to increase according to primary amino group content and coating thickness, which in turn can be regulated by plasma power parameters, allowing tailoring the coating chemical properties. The increase in adherence can be correlated to the total and primary amino group contents in the film, indicating covalent bonding of epoxy groups to the primer as the basis of the mechanical improvement.

  9. Electrochromic Devices Deposited on Low-Temperature Plastics by Plasma-Enhanced Chemical Vapor Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Robbins, Joshua; Seman, Michael

    2005-09-20

    Electrochromic windows have been identified by the Basic energy Sciences Advisory committee as an important technology for the reduction of energy spent on heating and cooling in residential and commercial buildings. Electrochromic devices have the ability to reversibly alter their optical properties in response to a small electric field. By blocking ultraviolet and infrared radiation, while modulating the incoming visible radiation, electrochromics could reduce energy consumption by several Quads per year. This amounts to several percent of the total annual national energy expenditures. The purpose of this project was to demonstrate proof of concept for using plasma-enhanced chemical vapor deposition (PECVD) for depositing all five layers necessary for full electrochromic devices, as an alternative to sputtering techniques. The overall goal is to produce electrochromic devices on flexible polymer substrates using PECVD to significantly reduce the cost of the final product. We have successfully deposited all of the films necessary for a complete electrochromic devices using PECVD. The electrochromic layer, WO3, displayed excellent change in visible transmission with good switching times. The storage layer, V2O5, exhibited a high storage capacity and good clear state transmission. The electrolyte, Ta2O5, was shown to functional with good electrical resistivity to go along with the ability to transfer Li ions. There were issues with leakage over larger areas, which can be address with further process development. We developed a process to deposit ZnO:Ga with a sheet resistance of < 50 W/sq. with > 90% transmission. Although we were not able to deposit on polymers due to the temperatures required in combination with the inverted position of our substrates. Two types of full devices were produced. Devices with Ta2O5 were shown to be functional using small aluminum dots as the top contact. The polymer electrolyte devices were shown to have a clear state transmission of

  10. Arc Plasma Torch Modeling

    CERN Document Server

    Trelles, J P; Vardelle, A; Heberlein, J V R

    2013-01-01

    Arc plasma torches are the primary components of various industrial thermal plasma processes involving plasma spraying, metal cutting and welding, thermal plasma CVD, metal melting and remelting, waste treatment and gas production. They are relatively simple devices whose operation implies intricate thermal, chemical, electrical, and fluid dynamics phenomena. Modeling may be used as a means to better understand the physical processes involved in their operation. This paper presents an overview of the main aspects involved in the modeling of DC arc plasma torches: the mathematical models including thermodynamic and chemical non-equilibrium models, turbulent and radiative transport, thermodynamic and transport property calculation, boundary conditions and arc reattachment models. It focuses on the conventional plasma torches used for plasma spraying that include a hot-cathode and a nozzle anode.

  11. Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements.

    Science.gov (United States)

    Melo, Luis; Burton, Geoff; Kubik, Philip; Wild, Peter

    2016-04-04

    Long period gratings (LPGs) are coated with hafnium oxide using plasma-enhanced atomic layer deposition (PEALD) to increase the sensitivity of these devices to the refractive index of the surrounding medium. PEALD allows deposition at low temperatures which reduces thermal degradation of UV-written LPGs. Depositions targeting three different coating thicknesses are investigated: 30 nm, 50 nm and 70 nm. Coating thickness measurements taken by scanning electron microscopy of the optical fibers confirm deposition of uniform coatings. The performance of the coated LPGs shows that deposition of hafnium oxide on LPGs induces two-step transition behavior of the cladding modes.

  12. Enhanced ethanol production by removal of cutin and epicuticular waxes of wheat straw by plasma assisted pretreatment

    DEFF Research Database (Denmark)

    Kádár, Zsófia; Schultz-Jensen, Nadja; Jensen, J. S.

    2015-01-01

    The removal of cutin and epicuticular waxes of wheat straw by PAP (plasma assisted pretreatment) was investigated. Wax removal was observed by Attenuated Total Reflectance-Fourier Transform Infrared (ATR-FTIR) as chemical change on the surface of most intensively pretreated samples as well...... as with Scanning Electron Microscopy (SEM) imaging. Compounds resulting from wax degradation were analyzed in the washing water of PAP wheat straw. The wax removal enhanced enzymatic hydrolysis yield and, consequently, the efficiency of wheat straw conversion into ethanol. In total, PAP increased the conversion...

  13. The Effect of Multipole-Enhanced Diffusion on the Joule Heating of a Cold Non-Neutral Plasma

    CERN Document Server

    Chapman, Steven Francis

    One proposed technique for trapping anti-atoms is to superimpose a Ioffe-Pritchard style magnetic-minimum neutral trap on a standard Penning trap used to trap the charged atomic constituents. Adding a magnetic multipole field in this way removes the azimuthal symmetry of the ideal Penning trap and introduces a new avenue for radial diffusion. Enhanced diffusion will lead to increased Joule heating of a non-neutral plasma, potentially adversely affecting the formation rate of anti-atoms and increasing the required trap depth. We present a model of this effect, along with an approach to minimizing it, with comparison to measurements from an intended anti-atom trap.

  14. Changes in CVD risk factors in the activity counseling trial

    Directory of Open Access Journals (Sweden)

    Meghan Baruth

    2011-01-01

    Full Text Available Meghan Baruth1, Sara Wilcox1, James F Sallis3, Abby C King4,5, Bess H Marcus6, Steven N Blair1,21Department of Exercise Science, 2Department of Epidemiology and Biostatistics, Arnold School of Public Health, University of South Carolina, Public Health Research Center, Columbia, SC, USA; 3Department of Psychology, San Diego State University, San Diego, CA, USA; 4Department of Health Research and Policy, 5Stanford Prevention Research Center, Department of Medicine, Stanford University School of Medicine, Stanford, CA, USA; 6Behavioral and Social Sciences Section, Brown University Program in Public Health, Providence, RI, USAAbstract: Primary care facilities may be a natural setting for delivering interventions that focus on behaviors that improve cardiovascular disease (CVD risk factors. The purpose of this study was to examine the 24-month effects of the Activity Counseling Trial (ACT on CVD risk factors, to examine whether changes in CVD risk factors differed according to baseline risk factor status, and to examine whether changes in fitness were associated with changes in CVD risk factors. ACT was a 24-month multicenter randomized controlled trial to increase physical activity. Participants were 874 inactive men and women aged 35–74 years. Participants were randomly assigned to one of three arms that varied by level of counseling, intensity, and resource requirements. Because there were no significant differences in change over time between arms on any of the CVD risk factors examined, all arms were combined, and the effects of time, independent of arm, were examined separately for men and women. Time × Baseline risk factor status interactions examined whether changes in CVD risk factors differed according to baseline risk factor status. Significant improvements in total cholesterol, high-density lipoprotein cholesterol (HDL-C and low-density lipoprotein cholesterol, the ratio of total cholesterol to HDL-C, and triglycerides were seen in

  15. Enhancement of carbon-steel peel adhesion to rubber blend using atmospheric pressure plasma

    Science.gov (United States)

    Kršková, Jana; Skácelová, Dana; Kováčik, Dušan; Ráhel', Jozef; Pret'o, Jozef; Černák, Mirko

    2016-08-01

    The surface of carbon-steel plates was modified by non-equilibrium plasma of diffuse coplanar surface barrier discharge (DCSBD) in order to improve the adhesive properties to the NR (natural rubber) green rubber compound. The effect of different treatment times as well as different input power and frequency of supplied high voltage was investigated. The samples were characterized using contact angle and surface free energy measurement, measurement of adhesive properties, scanning electron microscopy (SEM) and atomic force microscopy (AFM). Surface chemical composition was studied by energy-dispersive X-ray spectroscopy (EDX). Significant increase in wettability was observed even after 2 s of plasma exposure. The surface modification was confirmed also by peel test, where the best results were obtained for 6 s of plasma treatment. In addition the ageing effect was studied to investigate the durability of modification, which is crucial for the industrial applications. Contribution to the topical issue "6th Central European Symposium on Plasma Chemistry (CESPC-6)", edited by Nicolas Gherardi, Ester Marotta and Cristina Paradisi

  16. Enhanced Electron Attachment to Highly-Excited Molecules and Its Applications in Pulsed Plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Ding, W.X.; Ma, C.Y.; McCorkle, D.L.; Pinnaduwage, L.A.

    1999-06-27

    Studies conducted over the past several years have shown that electron attachment to highly-excited states of molecules have extremely large cross sections. We will discuss the implications of this for pulsed discharges used for H- generation, material processing, and plasma remediation.

  17. Developments in plasma enhanced spatial ALD for high throughput applications [3.04

    NARCIS (Netherlands)

    Creyghton, Y.; Illiberi, A.; Mione, M.; Boekel, W. van; Debernardi, N.; Seitz, M.; Bruele, F. van den; Poodt, P.; Roozeboom,F.

    2016-01-01

    Atomic layer deposition by means of spatial separation of reactive gases is emerging as an industrial manufacturing technology. Integration of non-thermal plasma in spatial ALD machines will further expand the process window towards lower operation temperatures and specific materials requiring radic

  18. Enhancement of hydrophobicity and tensile strength of muga silk fiber by radiofrequency Ar plasma discharge

    Science.gov (United States)

    Gogoi, D.; Choudhury, A. J.; Chutia, J.; Pal, A. R.; Dass, N. N.; Devi, D.; Patil, D. S.

    2011-10-01

    The hydrophobicity and tensile strength of muga silk fiber are investigated using radiofrequency (RF) Ar plasma treatment at various RF powers (10-30 W) and treatment times (5-20 min). The Ar plasma is characterized using self-compensated Langmuir and emissive probe. The ion energy is observed to play an important role in determining the tensile strength and hydrophobicity of the plasma treated fibers. The chemical compositions of the fibers are observed to be affected by the increase in RF power rather than treatment time. XPS study reveals that the ions that are impinging on the substrates are mainly responsible for the cleavage of peptide bond and side chain of amino acid groups at the surface of the fibers. The observed properties (tensile strength and hydrophobicity) of the treated fibers are found to be dependent on their variation in atomic concentration and functional composition at the surfaces. All the treated muga fibers exhibit almost similar thermal behavior as compared to the virgin one. At RF power of 10 W and treatment time range of 5-20 min, the treated fibers exhibit properties similar to that of the virgin one. Higher RF power (30 W) and the increase in treatment time deteriorate the properties of the fibers due to incorporation of more surface roughness caused by sufficiently high energetic ion bombardment. The properties of the plasma treated fibers are attempted to correlate with the XPS analysis and their surface morphologies.

  19. Enhancement of hydrophobicity and tensile strength of muga silk fiber by radiofrequency Ar plasma discharge

    Energy Technology Data Exchange (ETDEWEB)

    Gogoi, D.; Choudhury, A.J. [Physical Sciences Division, Institute of Advanced Study in Science and Technology, Paschim Boragaon, Guwahati 781035, Assam (India); Chutia, J., E-mail: joyanti_c@sify.com [Physical Sciences Division, Institute of Advanced Study in Science and Technology, Paschim Boragaon, Guwahati 781035, Assam (India); Pal, A.R.; Dass, N.N. [Physical Sciences Division, Institute of Advanced Study in Science and Technology, Paschim Boragaon, Guwahati 781035, Assam (India); Devi, D. [Life Sciences Division, Institute of Advanced Study in Science and Technology, Paschim Boragaon, Guwahati 781035, Assam (India); Patil, D.S. [Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai 400085 (India)

    2011-10-15

    The hydrophobicity and tensile strength of muga silk fiber are investigated using radiofrequency (RF) Ar plasma treatment at various RF powers (10-30 W) and treatment times (5-20 min). The Ar plasma is characterized using self-compensated Langmuir and emissive probe. The ion energy is observed to play an important role in determining the tensile strength and hydrophobicity of the plasma treated fibers. The chemical compositions of the fibers are observed to be affected by the increase in RF power rather than treatment time. XPS study reveals that the ions that are impinging on the substrates are mainly responsible for the cleavage of peptide bond and side chain of amino acid groups at the surface of the fibers. The observed properties (tensile strength and hydrophobicity) of the treated fibers are found to be dependent on their variation in atomic concentration and functional composition at the surfaces. All the treated muga fibers exhibit almost similar thermal behavior as compared to the virgin one. At RF power of 10 W and treatment time range of 5-20 min, the treated fibers exhibit properties similar to that of the virgin one. Higher RF power (30 W) and the increase in treatment time deteriorate the properties of the fibers due to incorporation of more surface roughness caused by sufficiently high energetic ion bombardment. The properties of the plasma treated fibers are attempted to correlate with the XPS analysis and their surface morphologies.

  20. Plasma and Laser-Enhanced Deposition of Powders and Thin Films.

    Science.gov (United States)

    David, Moses

    The objective of this thesis has been the development of novel plasma and laser based techniques for the deposition and characterization of thin films and nano-scale powders. The different energy sources utilized for excitation and break -down of reactive species prior to deposition include an RF plasma discharge, an excimer laser and a CO _2 laser. Nanometer-scale (10-20 nm) powders and thin films of aluminum nitride (AlN) have been successfully deposited in a glow discharge by reacting trimethylaluminum and ammonia. Macroquantities (~800 mg/hr) of powder have been collected at the centers of two vortices around which the reactant gases swirl. Powders of AlN have large surface areas (85 m^2/g) and are free from oxygen contamination. Diamond-like-carbon (DLC) films have been deposited from ternary mixtures of butadiene, argon and hydrogen. DLC films have been etched in O _2 and CF_4/O _2 plasmas. The etching behavior was correlated with the deposition feed gas composition by combining the etch rate, bias voltage during deposition and the deposition rate into a new non-dimensional number. Two new processes for depositing copper films have been developed. The first technique involves the hydrogen plasma reduction of copper formate films and the second technique involves the reactive excimer laser ablation of copper formate. Particle forming plasmas have been characterized by measuring the light scattering intensity during the deposition of silicon nitride from silane/ammonia plasmas. Both spatial variations and transients during the plasma start -up and shut-off steps have been measured. The ultraviolet (vacuum ultraviolet and extreme ultraviolet) reflectance characteristics of AlN, DLC and SiC thin films has been measured. AlN and SiC films exhibit a relatively high (~20-40%) reflectance in the different regions of the ultraviolet spectrum. An improved algorithm has been developed for estimating thin film parameters such as thickness, refractive index, band-gap, and

  1. Enhanced plasma wave detection of terahertz radiation using multiple high electron-mobility transistors connected in series

    KAUST Repository

    Elkhatib, Tamer A.

    2010-02-01

    We report on enhanced room-temperature detection of terahertz radiation by several connected field-effect transistors. For this enhanced nonresonant detection, we have designed, fabricated, and tested plasmonic structures consisting of multiple InGaAs/GaAs pseudomorphic high electron-mobility transistors connected in series. Results show a 1.63-THz response that is directly proportional to the number of detecting transistors biased by a direct drain current at the same gate-to-source bias voltages. The responsivity in the saturation regime was found to be 170 V/W with the noise equivalent power in the range of 10-7 W/Hz0.5. The experimental data are in agreement with the detection mechanism based on the rectification of overdamped plasma waves excited by terahertz radiation in the transistor channel. © 2010 IEEE.

  2. Highly efficient shrinkage of inverted-pyramid silicon nanopores by plasma-enhanced chemical vapor deposition technology

    Science.gov (United States)

    Wang, Yifan; Deng, Tao; Chen, Qi; Liang, Feng; Liu, Zewen

    2016-06-01

    Solid-state nanopore-based analysis systems are currently one of the most attractive and promising platforms in sensing fields. This work presents a highly efficient method to shrink inverted-pyramid silicon nanopores using plasma-enhanced chemical vapor deposition (PECVD) technology by the deposition of SiN x onto the surface of the nanopore. The contraction of the inverted-pyramid silicon nanopores when subjected to the PECVD process has been modeled and carefully analyzed, and the modeling data are in good agreement with the experimental results within a specific PECVD shrinkage period (˜0-600 s). Silicon nanopores within a 50-400 nm size range contract to sub-10 nm dimensions. Additionally, the inner structure of the nanopores after the PECVD process has been analyzed by focused ion beam cutting process. The results show an inner structure morphology change from inverted-pyramid to hourglass, which may enhance the spatial resolution of sensing devices.

  3. Highly efficient shrinkage of inverted-pyramid silicon nanopores by plasma-enhanced chemical vapor deposition technology.

    Science.gov (United States)

    Wang, Yifan; Deng, Tao; Chen, Qi; Liang, Feng; Liu, Zewen

    2016-06-24

    Solid-state nanopore-based analysis systems are currently one of the most attractive and promising platforms in sensing fields. This work presents a highly efficient method to shrink inverted-pyramid silicon nanopores using plasma-enhanced chemical vapor deposition (PECVD) technology by the deposition of SiN x onto the surface of the nanopore. The contraction of the inverted-pyramid silicon nanopores when subjected to the PECVD process has been modeled and carefully analyzed, and the modeling data are in good agreement with the experimental results within a specific PECVD shrinkage period (∼0-600 s). Silicon nanopores within a 50-400 nm size range contract to sub-10 nm dimensions. Additionally, the inner structure of the nanopores after the PECVD process has been analyzed by focused ion beam cutting process. The results show an inner structure morphology change from inverted-pyramid to hourglass, which may enhance the spatial resolution of sensing devices.

  4. Runaway electron generation as possible trigger for enhancement of magnetohydrodynamic plasma activity and fast changes in runaway beam behavior

    Energy Technology Data Exchange (ETDEWEB)

    Pankratov, I. M., E-mail: pankratov@kipt.kharkov.ua, E-mail: rjzhou@ipp.ac.cn [Institute of Plasma Physics, NSC Kharkov Institute of Physics and Technology, Academicheskaya Str. 1, 61108 Kharkov (Ukraine); Zhou, R. J., E-mail: pankratov@kipt.kharkov.ua, E-mail: rjzhou@ipp.ac.cn; Hu, L. Q. [Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031 (China)

    2015-07-15

    Peculiar phenomena were observed during experiments with runaway electrons: rapid changes in the synchrotron spot and its intensity that coincided with stepwise increases in the electron cyclotron emission (ECE) signal (cyclotron radiation of suprathermal electrons). These phenomena were initially observed in TEXTOR (Tokamak Experiment for Technology Oriented Research), where these events only occurred in the current decay phase or in discharges with thin stable runaway beams at a q = 1 drift surface. These rapid changes in the synchrotron spot were interpreted by the TEXTOR team as a fast pitch angle scattering event. Recently, similar rapid changes in the synchrotron spot and its intensity that coincided with stepwise increases in the non-thermal ECE signal were observed in the EAST (Experimental Advanced Superconducting Tokamak) runaway discharge. Runaway electrons were located around the q = 2 rational magnetic surface (ring-like runaway electron beam). During the EAST runaway discharge, stepwise ECE signal increases coincided with enhanced magnetohydrodynamic (MHD) activity. This behavior was peculiar to this shot. In this paper, we show that these non-thermal ECE step-like jumps were related to the abrupt growth of suprathermal electrons induced by bursting electric fields at reconnection events during this MHD plasma activity. Enhancement of the secondary runaway electron generation also occurred simultaneously. Local changes in the current-density gradient appeared because of local enhancement of the runaway electron generation process. These current-density gradient changes are considered to be a possible trigger for enhancement of the MHD plasma activity and the rapid changes in runaway beam behavior.

  5. High Fat Diet Exposure during Fetal Life Enhances Plasma and Hepatic Omega-6 Fatty Acid Profiles in Fetal Wistar Rats

    Directory of Open Access Journals (Sweden)

    Marlon E. Cerf

    2015-08-01

    Full Text Available Pregnant rats were fed a high fat diet (HFD for the first (HF1, second (HF2, third (HF3 or all three weeks (HFG of gestation. Maintenance on a HFD during specific periods of gestation was hypothesized to alter fetal glycemia, insulinemia, induce insulin resistance; and alter fetal plasma and hepatic fatty acid (FA profiles. At day 20 of gestation, fetal plasma and hepatic FA profiles were determined by gas chromatography; body weight, fasting glycemia, insulinemia and the Homeostasis Model Assessment (HOMA-insulin resistance were also determined. HF3 fetuses were heaviest concomitant with elevated glycemia and insulin resistance (p < 0.05. HFG fetuses had elevated plasma linoleic (18:2 n-6 and arachidonic (20:4 n-6 acid proportions (p < 0.05. In the liver, HF3 fetuses displayed elevated linoleic, eicosatrienoic (20:3 n-6 and arachidonic acid proportions (p < 0.05. HFG fetuses had reduced hepatic docosatrienoic acid (22:5 n-3 proportions (p < 0.05. High fat maintenance during the final week of fetal life enhances hepatic omega-6 FA profiles in fetuses concomitant with hyperglycemia and insulin resistance thereby presenting a metabolically compromised phenotype.

  6. A combination of CO2 laser and plasma surface modification of poly(etheretherketone) to enhance osteoblast response

    Science.gov (United States)

    Zheng, Yanyan; Xiong, Chengdong; Wang, Zhecun; Li, Xiaoyu; Zhang, Lifang

    2015-07-01

    Poly(etheretherketone) (PEEK) is a rigid semicrystalline polymer that combines excellent mechanical properties, broad chemical resistance and bone-like stiffness and is widely used in biomedical fields. However, the bio-inert surface of PEEK tends to hinder its biomedical applications when direct osteointegration between the implants and the host tissue is desired. In this work, we demonstrate a dual modification method, which combines the laser and plasma surface treatment to combine advantages of both chemical states and microstructures for osteoblasts responses. While the plasma treatment introduces surface carboxyl groups (sbnd COOH) onto PEEK surface, the laser treatment constructs microstructures over the PEEK surface. Our results indicated that sbnd COOH as well as microgrooves containing micropores or microcraters structure are constructed on PEEK surface and plasma treatment has no apparent effect on the morphology of microstructures produced by laser micromachining. Unexpectedly, the superior mechanical properties of PEEK were maintained irrespective of the treatment used. Compared to native PEEK and single treated PEEK, dual modified PEEK is more favorable for pre-osteoblasts (MC3T3-E1) adhesion, spreading and proliferation. Moreover, cell pseudopodia protrude into the micropores or microcraters, in favor of forming firmer bone-implant integration. Our study illustrates enhanced osteoblasts responses to dual treated PEEK surface, which gives beneficial information of its potential use in orthopedic or dental implants.

  7. Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride

    Science.gov (United States)

    Provine, J.; Schindler, Peter; Kim, Yongmin; Walch, Steve P.; Kim, Hyo Jin; Kim, Ki-Hyun; Prinz, Fritz B.

    2016-06-01

    The continued scaling in transistors and memory elements has necessitated the development of atomic layer deposition (ALD) of silicon nitride (SiNx), particularly for use a low k dielectric spacer. One of the key material properties needed for SiNx films is a low wet etch rate (WER) in hydrofluoric (HF) acid. In this work, we report on the evaluation of multiple precursors for plasma enhanced atomic layer deposition (PEALD) of SiNx and evaluate the film's WER in 100:1 dilutions of HF in H2O. The remote plasma capability available in PEALD, enabled controlling the density of the SiNx film. Namely, prolonged plasma exposure made films denser which corresponded to lower WER in a systematic fashion. We determined that there is a strong correlation between WER and the density of the film that extends across multiple precursors, PEALD reactors, and a variety of process conditions. Limiting all steps in the deposition to a maximum temperature of 350 °C, it was shown to be possible to achieve a WER in PEALD SiNx of 6.1 Å/min, which is similar to WER of SiNx from LPCVD reactions at 850 °C.

  8. Direct fabrication of 3D graphene on nanoporous anodic alumina by plasma-enhanced chemical vapor deposition

    Science.gov (United States)

    Zhan, Hualin; Garrett, David J.; Apollo, Nicholas V.; Ganesan, Kumaravelu; Lau, Desmond; Prawer, Steven; Cervenka, Jiri

    2016-01-01

    High surface area electrode materials are of interest for a wide range of potential applications such as super-capacitors and electrochemical cells. This paper describes a fabrication method of three-dimensional (3D) graphene conformally coated on nanoporous insulating substrate with uniform nanopore size. 3D graphene films were formed by controlled graphitization of diamond-like amorphous carbon precursor films, deposited by plasma-enhanced chemical vapour deposition (PECVD). Plasma-assisted graphitization was found to produce better quality graphene than a simple thermal graphitization process. The resulting 3D graphene/amorphous carbon/alumina structure has a very high surface area, good electrical conductivity and exhibits excellent chemically stability, providing a good material platform for electrochemical applications. Consequently very large electrochemical capacitance values, as high as 2.1 mF for a sample of 10 mm3, were achieved. The electrochemical capacitance of the material exhibits a dependence on bias voltage, a phenomenon observed by other groups when studying graphene quantum capacitance. The plasma-assisted graphitization, which dominates the graphitization process, is analyzed and discussed in detail.

  9. Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride

    Energy Technology Data Exchange (ETDEWEB)

    Provine, J., E-mail: jprovine@stanford.edu; Schindler, Peter; Kim, Yongmin; Walch, Steve P.; Kim, Hyo Jin [Department of Mechanical Engineering, Stanford University, Stanford, California 94305 (United States); Kim, Ki-Hyun [Manufacturing Technology Center, Samsung Electronics, Suwon, Gyeonggi-Do (Korea, Republic of); Prinz, Fritz B. [Department of Mechanical Engineering, Stanford University, Stanford, California 94305 (United States); Department of Materials Science and Engineering, Stanford University, Stanford, California 94305 (United States)

    2016-06-15

    The continued scaling in transistors and memory elements has necessitated the development of atomic layer deposition (ALD) of silicon nitride (SiN{sub x}), particularly for use a low k dielectric spacer. One of the key material properties needed for SiN{sub x} films is a low wet etch rate (WER) in hydrofluoric (HF) acid. In this work, we report on the evaluation of multiple precursors for plasma enhanced atomic layer deposition (PEALD) of SiN{sub x} and evaluate the film’s WER in 100:1 dilutions of HF in H{sub 2}O. The remote plasma capability available in PEALD, enabled controlling the density of the SiN{sub x} film. Namely, prolonged plasma exposure made films denser which corresponded to lower WER in a systematic fashion. We determined that there is a strong correlation between WER and the density of the film that extends across multiple precursors, PEALD reactors, and a variety of process conditions. Limiting all steps in the deposition to a maximum temperature of 350 °C, it was shown to be possible to achieve a WER in PEALD SiN{sub x} of 6.1 Å/min, which is similar to WER of SiN{sub x} from LPCVD reactions at 850 °C.

  10. A Revival of Waste: Atmospheric Pressure Nitrogen Plasma Jet Enhanced Jumbo Silicon/Silicon Carbide Composite in Lithium Ion Batteries.

    Science.gov (United States)

    Chen, Bing-Hong; Chuang, Shang-I; Liu, Wei-Ren; Duh, Jenq-Gong

    2015-12-30

    In this study, a jumbo silicon/silicon carbide (Si/SiC) composite (JSC), a novel anode material source, was extracted from solar power industry cutting waste and used as a material for lithium-ion batteries (LIBs), instead of manufacturing the nanolized-Si. Unlike previous methods used for preventing volume expansion and solid electrolyte interphase (SEI), the approach proposed here simply entails applying surface modification to JSC-based electrodes by using nitrogen-atmospheric pressure plasma jet (N-APPJ) treatment process. Surface organic bonds were rearranged and N-doped compounds were formed on the electrodes through applying different plasma treatment durations, and the qualitative examinations of before/after plasma treatment were identified by X-ray photoelectron spectroscopy (XPS) and electron probe microanalyzer (EPMA). The surface modification resulted in the enhancement of electrochemical performance with stable capacity retention and high Coulombic efficiency. In addition, depth profile and scanning electron microscope (SEM) images were executed to determine the existence of Li-N matrix and how the nitrogen compounds change the surface conditions of the electrodes. The N-APPJ-induced rapid surface modification is a major breakthrough for processing recycled waste that can serve as anode materials for next-generation high-performance LIBs.

  11. Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride

    Directory of Open Access Journals (Sweden)

    J. Provine

    2016-06-01

    Full Text Available The continued scaling in transistors and memory elements has necessitated the development of atomic layer deposition (ALD of silicon nitride (SiNx, particularly for use a low k dielectric spacer. One of the key material properties needed for SiNx films is a low wet etch rate (WER in hydrofluoric (HF acid. In this work, we report on the evaluation of multiple precursors for plasma enhanced atomic layer deposition (PEALD of SiNx and evaluate the film’s WER in 100:1 dilutions of HF in H2O. The remote plasma capability available in PEALD, enabled controlling the density of the SiNx film. Namely, prolonged plasma exposure made films denser which corresponded to lower WER in a systematic fashion. We determined that there is a strong correlation between WER and the density of the film that extends across multiple precursors, PEALD reactors, and a variety of process conditions. Limiting all steps in the deposition to a maximum temperature of 350 °C, it was shown to be possible to achieve a WER in PEALD SiNx of 6.1 Å/min, which is similar to WER of SiNx from LPCVD reactions at 850 °C.

  12. Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor

    Energy Technology Data Exchange (ETDEWEB)

    Suh, Sungin; Kim, Jun-Rae; Kim, Seongkyung; Hwang, Cheol Seong; Kim, Hyeong Joon, E-mail: thinfilm@snu.ac.kr [Department of Materials Science and Engineering with Inter-University Semiconductor Research Center (ISRC), Seoul National University, 599 Gwanak-ro, Gwanak-gu, Seoul 08826 (Korea, Republic of); Ryu, Seung Wook, E-mail: tazryu78@gmail.com [Department of Electrical Engineering, Stanford University, Stanford, California 94305-2311 (United States); Cho, Seongjae [Department of Electronic Engineering and New Technology Component & Material Research Center (NCMRC), Gachon University, Seongnam-si, Gyeonggi-do 13120 (Korea, Republic of)

    2016-01-15

    It has not been an easy task to deposit SiN at low temperature by conventional plasma-enhanced atomic layer deposition (PE-ALD) since Si organic precursors generally have high activation energy for adsorption of the Si atoms on the Si-N networks. In this work, in order to achieve successful deposition of SiN film at low temperature, the plasma processing steps in the PE-ALD have been modified for easier activation of Si precursors. In this modification, the efficiency of chemisorption of Si precursor has been improved by additional plasma steps after purging of the Si precursor. As the result, the SiN films prepared by the modified PE-ALD processes demonstrated higher purity of Si and N atoms with unwanted impurities such as C and O having below 10 at. % and Si-rich films could be formed consequently. Also, a very high step coverage ratio of 97% was obtained. Furthermore, the process-optimized SiN film showed a permissible charge-trapping capability with a wide memory window of 3.1 V when a capacitor structure was fabricated and measured with an insertion of the SiN film as the charge-trap layer. The modified PE-ALD process using the activated Si precursor would be one of the most practical and promising solutions for SiN deposition with lower thermal budget and higher cost-effectiveness.

  13. CVD growth of graphene under exfoliated hexagonal boron nitride for vertical hybrid structures

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Min [SKKU Advanced Institute of Nanotechnology (SAINT) (Korea, Republic of); Center for Human Interface Nanotechnology (HINT) (Korea, Republic of); Jang, Sung Kyu [SKKU Advanced Institute of Nanotechnology (SAINT) (Korea, Republic of); Song, Young Jae [SKKU Advanced Institute of Nanotechnology (SAINT) (Korea, Republic of); Department of Physics, Sungkyunkwan University (SKKU), Suwon 440-746 (Korea, Republic of); Lee, Sungjoo, E-mail: leesj@skku.edu [SKKU Advanced Institute of Nanotechnology (SAINT) (Korea, Republic of); Center for Human Interface Nanotechnology (HINT) (Korea, Republic of); College of Information and Communication Engineering, Sungkyunkwan University (SKKU), Suwon 440-746 (Korea, Republic of)

    2015-01-15

    Graphical abstract: We have demonstrated a novel yet simple method for fabricating graphene-based vertical hybrid structures by performing the CVD growth of graphene at an h-BN/Cu interface. Our systematic Raman measurements combined with plasma etching process indicate that a graphene film is grown under exfoliated h-BN rather than on its top surface, and that an h-BN/graphene vertical hybrid structure has been fabricated. Electrical transport measurements of this h-BN/graphene, transferred on SiO2, show the carrier mobility up to approximately 2250 cm{sup 2} V{sup −1} s{sup −1}. The developed method would enable the exploration of the possibility of novel hybrid structure integration with two-dimensional material systems. - Abstract: We have demonstrated a novel yet simple method for fabricating graphene-based vertical hybrid structures by performing the CVD growth of graphene at an h-BN/Cu interface. Our systematic Raman measurements combined with plasma etching process indicate that a graphene film is grown under exfoliated h-BN rather than on its top surface, and that an h-BN/graphene vertical hybrid structure has been fabricated. Electrical transport measurements of this h-BN/graphene, transferred on SiO{sub 2}, show the carrier mobility up to approximately 2250 cm{sup 2} V{sup −1} s{sup −1}. The developed method would enable the exploration of the possibility of novel hybrid structure integration with two-dimensional material systems.

  14. Plasma-enhanced deposition of antifouling layers on silicone rubber surfaces

    Science.gov (United States)

    Jiang, Hongquan

    In food processing and medical environments, biofilms serve as potential sources of contamination, and lead to food spoilage, transmission of diseases or infections. Because of its ubiquitous and recalcitrant nature, Listeria monocytogenes biofilm is especially hard to control. Generating antimicrobial surfaces provide a method to control the bacterial attachment. The difficulty of silver deposition on polymeric surfaces has been overcome by using a unique two-step plasma-mediated method. First silicone rubber surfaces were plasma-functionalized to generate aldehyde groups. Then thin silver layers were deposited onto the functionalized surfaces according to Tollen's reaction. X-ray photoelectron spectroscopy (XPS), atomic force spectroscopy (AFM) and scanning electron microscopy (SEM) showed that silver particles were deposited. By exposing the silver coated surfaces to L. monocytogenes, it was demonstrated that they were bactericidal to L. monocytogenes. No viable bacteria were detected after 12 to 18 h on silver-coated silicone rubber surfaces. Another antifouling approach is to generate polyethylene glycol (PEG) thin layer instead of silver on polymer surfaces. Covalent bond of PEG structures of various molecular weights to cold-plasma-functionalized polymer surfaces, such as silicone rubber, opens up a novel way for the generation of PEG brush-like or PEG branch-like anti-fouling layers. In this study, plasma-generated surface free radicals can react efficiently with dichlorosilane right after plasma treatment. With the generation of halo-silane groups, this enables PEG molecules to be grafted onto the modified surfaces. XPS data clearly demonstrated the presence of PEG molecules on plasma-functionalized silicone rubber surfaces. AFM images showed the changed surface morphologies as a result of covalent attachment to the surface of PEG molecules. Biofilm experiment results suggest that the PEG brush-like films have the potential ability to be the next

  15. Enhancement of surface properties on commercial polymer packaging films using various surface treatment processes (fluorination and plasma)

    Energy Technology Data Exchange (ETDEWEB)

    Peyroux, Jérémy, E-mail: jeremy.peyroux@univ-bpclermont.fr [Clermont Université, Université Blaise Pascal, Institut de Chimie de Clermont-Ferrand, BP 10448, F-63000 Clermont-Ferrand (France); CNRS, UMR 6296, Institut de Chimie de Clermont-Ferrand, F-63171 Aubière (France); Dubois, Marc, E-mail: marc.dubois@univ-bpclermont.fr [Clermont Université, Université Blaise Pascal, Institut de Chimie de Clermont-Ferrand, BP 10448, F-63000 Clermont-Ferrand (France); CNRS, UMR 6296, Institut de Chimie de Clermont-Ferrand, F-63171 Aubière (France); Tomasella, Eric, E-mail: eric.tomasella@univ-bpclermont.fr [Clermont Université, Université Blaise Pascal, Institut de Chimie de Clermont-Ferrand, BP 10448, F-63000 Clermont-Ferrand (France); CNRS, UMR 6296, Institut de Chimie de Clermont-Ferrand, F-63171 Aubière (France); Petit, Elodie, E-mail: elodie.petit@univ-bpclermont.fr [Clermont Université, Université Blaise Pascal, Institut de Chimie de Clermont-Ferrand, BP 10448, F-63000 Clermont-Ferrand (France); CNRS, UMR 6296, Institut de Chimie de Clermont-Ferrand, F-63171 Aubière (France); Flahaut, Delphine, E-mail: delphine.flahaut@univ-pau.fr [Université de Pau et des Pays de l’Adour, IPREM/ECP (UMR 5254), Hélioparc, 2 av. Pierre Angot, 64053 Pau cedex 9 (France)

    2014-10-01

    Graphical abstract: - Highlights: • Two different surface treatment processes were investigated in this work. • Both processes drastically change the composition induced on the surfaces. • Direct fluorination is identified as an efficient way to adjust surface properties. • Plasma processes result in a specific enhancement of the surface properties. • The pristine polymer surface has been successfully improved. - Abstract: Before considering their combination on commercial packaging films, two surface treatments processes were investigated. Indeed, direct fluorination and plasma processes are currently recognized as effective processes to improve polymer surface properties. The aim of this first work is to elucidate mechanisms that occur on the treated surface. The modifications of the surface layer were characterized using various complementary spectroscopy techniques such as Fourier Transform Infrared (FTIR) spectroscopy, high resolution solid state Nuclear Magnetic Resonance (NMR) with {sup 19}F nucleus which are suitable to determine the nature of bonding and specific groups formed during the process. X-ray Photoelectron Spectroscopy (XPS) was also achieved to extract the surface chemical compositions. In addition, surface properties of the treated films were studied by specific measurements of surface energy in order to reveal surface parameters such as rugosity and chemical composition which could be adjusted. All these results underline that the layer induced regardless of the two processes plays a key role in the enhancement of the surface properties.

  16. Hydrogen plasma reduced black TiO2sbnd B nanowires for enhanced photoelectrochemical water-splitting

    Science.gov (United States)

    Tian, Zhangliu; Cui, Huolei; Zhu, Guilian; Zhao, Wenli; Xu, JiJian; Shao, Feng; He, Jianqiao; Huang, Fuqiang

    2016-09-01

    Black TiO2 with various nanostructures and phase constitutions have been reported to exhibit excellent photocatalytic and photoelectrochemical (PEC) performance. Here, we report the fabrication of black nanostructured TiO2sbnd B through hydrogen plasma assisted reduction and its enhanced PEC properties for the first time. Both the obtained TiO2sbnd B and black TiO2sbnd B are single crystalline nanowires, while the black TiO2sbnd B samples exhibit much stronger visible and infrared light absorption. The optimal black TiO2sbnd B sample obtained by hydrogen plasma treatment at 425 °C yields a photocurrent density of 0.85 mA cm-2, a rather low onset potential of -0.937 VAg/AgCl and a high applied bias photon-to-current efficiency (ABPE) of 0.363%, which is far superior to the TiO2sbnd B (0.15 mA cm-2 photocurrent, -0.917 VAg/AgCl onset potential and 0.138% ABPE). The significantly enhanced PEC performance of the black TiO2sbnd B is ascribed to the introduction of moderate surface oxygen vacancies. These results indicate that the black TiO2sbnd B is a promising material for PEC application and solar energy utilization.

  17. A Preliminary Evaluation of Lyophilized Gelatin Sponges, Enhanced with Platelet-Rich Plasma, Hydroxyapatite and Chitin Whiskers for Bone Regeneration

    Directory of Open Access Journals (Sweden)

    Andrew J. Spence

    2013-04-01

    Full Text Available The purpose of this study was to perform a number of preliminary in vitro evaluations on an array of modified gelatin gel sponge scaffolds for use in a bone graft application. The gelatin gels were modified through the addition of a number of components which each possess unique properties conducive to the creation and regeneration of bone: a preparation rich in growth factors (PRGF, a bioactive, lyophilized form of platelet-rich plasma, hydroxyapatite, and chitin whiskers. Platelet-rich plasma therapy is an emerging practice that has proven effective in a number of clinical applications, including enhancing bone repair through improved deposition of new bony matrix and angiogenesis. As such, the inclusion of PRGF in our gelatin scaffolds was intended to significantly enhance scaffold bioactivity, while the addition of hydroxyapatite and chitin whiskers were anticipated to increase scaffold strength. Additionally, the gelatin sponges, which readily dissolve in aqueous solutions, were subjected to 1-Ethyl-3-[3-dimethylaminopropyl]carbodiimide hydrochloride (EDC cross-linking, either during or post-gelation, to control their rate of degradation. Scaffolds were evaluated in vitro with respect to compressive strength, mass loss/degradation, protein release, and cellular interaction, with results demonstrating the potential of the gelatin gel sponge scaffold for use in the regeneration of bone.

  18. Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor

    Energy Technology Data Exchange (ETDEWEB)

    Sulyaeva, Veronica S., E-mail: veronica@niic.nsc.ru [Department of Functional Materials Chemistry, Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk 630090 (Russian Federation); Kosinova, Marina L.; Rumyantsev, Yurii M.; Kuznetsov, Fedor A. [Department of Functional Materials Chemistry, Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk 630090 (Russian Federation); Kesler, Valerii G. [Laboratory of Physical Principles for Integrated Microelectronics, Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk 630090 (Russian Federation); Kirienko, Viktor V. [Laboratory of Nonequilibrium Semiconductors Systems, Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk 630090 (Russian Federation)

    2014-05-02

    Thin BC{sub x}N{sub y} films have been obtained by plasma enhanced chemical vapor deposition using N-trimethylborazine as a precursor. The films were deposited on Si(100) and fused silica substrates. The grown films were characterized by ellipsometry, Fourier transform infrared spectroscopy, scanning electron microscopy, X-ray energy dispersive spectroscopy, X-ray photoelectron spectroscopy, spectrophotometry, capacitance–voltage and current–voltage measurements. The deposition parameters, such as substrate temperature (373–973 K) and gas phase composition were varied. Low temperature BC{sub x}N{sub y} films were found to be high optical transparent layers in the range of 300–2000 nm, the transmittance as high as 93% has been achieved. BC{sub x}N{sub y} layers are dielectrics with dielectric constant k = 2.2–8.9 depending on the synthesis conditions. - Highlights: • Thin BC{sub x}N{sub y} films have been obtained by plasma enhanced chemical vapor deposition. • N-trimethylborazine was used as a precursor. • Low temperature BC{sub x}N{sub y} films were found to be high optical transparent layers (93%). • BC{sub x}N{sub y} layers are dielectrics with dielectric constant k = 2.2–8.9.

  19. Collisonal Friction Enhanced by Two-Stream Instabilities Determines the Bohm Criterion in Plasmas With Multiple Ion Species

    Science.gov (United States)

    Baalrud, S. D.; Hegna, C. C.; Callen, J. D.

    2009-10-01

    Ion-ion streaming instabilities are excited in the presheath region of plasmas with multiple ion species if the ions are much colder than the electrons. Streaming instabilities onset when the relative fluid flow between ion species exceeds a critical speed, δVc, of order the ion thermal speeds. Using a generalized Lenard-Balescu theory that accounts for instability-enhanced collective responses [1], one is able to show the instabilities rapidly (within a few Debye lengths) enhance the collisional friction between ion species far beyond the contribution from Coulomb collisions alone. This strong frictional force determines the relative fluid speed between species. When this condition is combined with the Bohm criterion generalized for multiple ion species, the fluid speed of each ion species is determined at the sheath edge. For each species, this speed differs from the common ``system'' sound speed by a factor that depends on the species concentration and δVc.[4pt] [1] S.D. Baalrud, J.D. Callen, and C.C. Hegna, Phys. Plasmas 15, 092111 (2008).

  20. Enhancement of proton conductivity of sulfonated polystyrene membrane prepared by plasma polymerization process

    Indian Academy of Sciences (India)

    Bhabesh Kumar Nath; Aziz Khan; Joyanti Chutia; Arup Ratan Pal; Heremba Bailung; Neelotpal Sen Sarma; Devasish Chowdhury; Nirab Chandra Adhikary

    2014-12-01

    This work reports the achievement of higher proton conductivity of polystyrene based proton exchange membrane synthesized in a continuous RF plasma polymerization process using two precursors, styrene (C8H8) and trifluoromethane sulfonic acid (CF3SO3H). The chemical composition of the developed membranes is investigated using Fourier transform infrared spectroscopy and energy dispersive spectroscopy. Scanning electron microscopy has been used for the study of surface morphology and thickness measurement of the membrane. The membranes deposited in the power range from 0.114 to 0.318 Wcm-2 exhibit a lot of variation in the properties like proton transport, water uptake, sulfonation rate, ion exchange capacity and thermal behaviour. The proton conductivity of the membranes is achieved up to 0.6 Scm-1, measured with the help of potentiostat/galvanostat. The thermogravimetric study of the plasma polymerized membrane shows the thermal stability up to 140 °C temperature.

  1. Growth of TiO2 with thermal and plasma enhanced atomic layer deposition.

    Science.gov (United States)

    Tallarida, Massimo; Friedrich, Daniel; Städter, Matthias; Michling, Marcel; Schmeisser, Dieter

    2011-09-01

    We show a comparative study of the TiO2 ALD with TTIP and either O2 or O2-plasma on Si/SiO2 substrates. In particular we compare the surface morphology and crystalline phase by means of Atomic Force Microscopy (AFM), X-ray Photoelectron Spectroscopy (XPS) and X-ray Absorption Spectroscopy (XAS) for different O2-plasma procedures upon changing the time between cycles and the N2-purging pressure. The AFM images show that already these parameters may induce structural changes in the TiO2 films grown by ALD, with the formation of crystallites with average lateral width varying between 15 and 80 nm. By means of XAS we also found that the crystallites have mixed anatase and rutile crystalline phases and that smaller crystallites have a greater rutile component than the larger ones.

  2. Plasma treatment on novel carbon fiber reinforced PEEK cages to enhance bioactivity

    Directory of Open Access Journals (Sweden)

    Banghard Michael

    2016-09-01

    Full Text Available Carbon fiber reinforced polyetheretherketone (CFR-PEEK has similar mechanical properties to human bone and is considered as the best alternative material to substitute titanium for spine cage implants. To compensate its poor osteogenic properties and limited bioinertness, CFR-PEEK was coated with a thin film of titanium. In the study, we investigated the biological response in vitro of titanium coated CFR-PEEK with different vacuum plasma pretreatments. The so modified surface revealed first hints for a good cell response by excellent cell adhesion and morphology of human osteoblast – like cells MG 63 (ATXX:’CRL-1427. Thus, the findings show that surface roughness of CFR-PEEK material has a profound effect on the biological activity via vacuum plasma treatment.

  3. Platelet-rich plasma: a biomimetic approach to enhancement of surgical wound healing.

    Science.gov (United States)

    Fernandez-Moure, Joseph S; Van Eps, Jeffrey L; Cabrera, Fernando J; Barbosa, Zonia; Medrano Del Rosal, Guillermo; Weiner, Bradley K; Ellsworth, Warren A; Tasciotti, Ennio

    2017-01-01

    Platelets are small anucleate cytoplasmic cell bodies released by megakaryocytes in response to various physiologic triggers. Traditionally thought to be solely involved in the mechanisms of hemostasis, platelets have gained much attention due to their involvement wound healing, immunomodulation, and antiseptic properties. As the field of surgery continues to evolve so does the need for therapies to aid in treating the increasingly complex patients seen. With over 14 million obstetric, musculoskeletal, and urological and gastrointestinal surgeries performed annually, the healing of surgical wounds continues to be of upmost importance to the surgeon and patient. Platelet-rich plasma, or platelet concentrate, has emerged as a possible adjuvant therapy to aid in the healing of surgical wounds and injuries. In this review, we will discuss the wound healing properties of platelet-rich plasma and various surgical applications. Copyright © 2016 Elsevier Inc. All rights reserved.

  4. Method of plasma enhanced chemical vapor deposition of diamond using methanol-based solutions

    Science.gov (United States)

    Tzeng, Yonhua (Inventor)

    2009-01-01

    Briefly described, methods of forming diamond are described. A representative method, among others, includes: providing a substrate in a reaction chamber in a non-magnetic-field microwave plasma system; introducing, in the absence of a gas stream, a liquid precursor substantially free of water and containing methanol and at least one carbon and oxygen containing compound having a carbon to oxygen ratio greater than one, into an inlet of the reaction chamber; vaporizing the liquid precursor; and subjecting the vaporized precursor, in the absence of a carrier gas and in the absence in a reactive gas, to a plasma under conditions effective to disassociate the vaporized precursor and promote diamond growth on the substrate in a pressure range from about 70 to 130 Torr.

  5. Enhanced reliability of drift-diffusion approximation for electrons in fluid models for nonthermal plasmas

    Directory of Open Access Journals (Sweden)

    M. M. Becker

    2013-01-01

    Full Text Available Common fluid models used for the description of electron transport in nonthermal discharge plasmas are subject to substantial restrictions if the electron energy transport significantly influences the discharge behaviour. A drift-diffusion approach is presented which is based on a multiterm approximation of the electron velocity distribution function and overcomes some of these restrictions. It is validated using a benchmark model and applied for the analysis of argon discharge plasmas at low and atmospheric pressure. The results are compared to those of common drift-diffusion models as well as to experimental data. It is pointed out that fluid models are able to describe nonlocal phenomena caused by electron energy transport, if the energy transport is consistently described. Numerical difficulties that frequently occur when the conventional drift-diffusion model is consistently applied are avoided by the proposed method.

  6. Enhancing Understanding of High Energy Density Plasmas Using Fluid Modeling with Kinetic Closures

    Science.gov (United States)

    Hansen, David; Held, Eric; Srinivasan, Bhuvana; Masti, Robert; King, Jake

    2016-10-01

    This work seeks to understand possible stabilization mechanisms of the early-time electrothermal instability in the evolution of the Rayleigh-Taylor instability in MagLIF (Magnetized Liner Inertial Fusion) experiments. Such mechanisms may include electron thermal conduction, viscosity, and large magnetic fields. Experiments have shown that the high-energy density plasmas from wire-array implosions require physics modelling that goes well beyond simple models such as ideal MHD. The plan is to develop a multi-fluid extended-MHD model that includes kinetic closures for thermal conductivity, resistivity, and viscosity using codes that are easily available to the wider research community. Such an effort would provide the community with a well-benchmarked tool capable of advanced modeling of high-energy-density plasmas.

  7. Gas mixing enhanced by power modulations in atmospheric pressure microwave plasma jet

    Science.gov (United States)

    Voráč, J.; Potočňáková, L.; Synek, P.; Hnilica, J.; Kudrle, V.

    2016-04-01

    Microwave plasma jet operating in atmospheric pressure argon was power modulated by audio frequency sine envelope in the 102 W power range. Its effluent was imaged using interference filters and ICCD camera for several different phases of the modulating signal. The combination of this fast imaging with spatially resolved optical emission spectroscopy provides useful insights into the plasmachemical processes involved. Phase-resolved schlieren photography was performed to visualize the gas dynamics. The results show that for higher modulation frequencies the plasma chemistry is strongly influenced by formation of transient flow perturbation resembling a vortex during each period. The perturbation formation and speed are strongly influenced by the frequency and power variations while they depend only weakly on the working gas flow rate. From application point of view, the perturbation presence significantly broadened lateral distribution of active species, effectively increasing cross-sectional area suitable for applications.

  8. Gas Diffusion Barriers Prepared by Spatial Atmospheric Pressure Plasma Enhanced ALD.

    Science.gov (United States)

    Hoffmann, Lukas; Theirich, Detlef; Pack, Sven; Kocak, Firat; Schlamm, Daniel; Hasselmann, Tim; Fahl, Henry; Räupke, André; Gargouri, Hassan; Riedl, Thomas

    2017-02-01

    In this work, we report on aluminum oxide (Al2O3) gas permeation barriers prepared by spatial ALD (SALD) at atmospheric pressure. We compare the growth characteristics and layer properties using trimethylaluminum (TMA) in combination with an Ar/O2 remote atmospheric pressure plasma for different substrate velocities and different temperatures. The resulting Al2O3 films show ultralow water vapor transmission rates (WVTR) on the order of 10(-6) gm(-2)d(-1). In notable contrast, plasma based layers already show good barrier properties at low deposition temperatures (75 °C), while water based processes require a growth temperature above 100 °C to achieve equally low WVTRs. The activation energy for the water permeation mechanism was determined to be 62 kJ/mol.

  9. Enhanced propagation for relativistic laser pulses in inhomogeneous plasmas using hollow channels.

    Science.gov (United States)

    Fuchs, J; d'Humières, E; Sentoku, Y; Antici, P; Atzeni, S; Bandulet, H; Depierreux, S; Labaune, C; Schiavi, A

    2010-11-26

    The influence of long (several millimeters) and hollow channels, bored in inhomogeneous ionized plasma by using a long pulse laser beam, on the propagation of short, ultraintense laser pulses has been studied. Compared to the case without a channel, propagation in channels significantly improves beam transmission and maintains a beam quality close to propagation in vacuum. In addition, the growth of the forward-Raman instability is strongly reduced. These results are beneficial for the direct scheme of the fast ignitor concept of inertial confinement fusion as we demonstrate, in fast-ignition-relevant conditions, that with such channels laser energy can be carried through increasingly dense plasmas close to the fuel core with minimal losses.

  10. Towards Enhanced Performance Thin-film Composite Membranes via Surface Plasma Modification

    OpenAIRE

    Rackel Reis; Dumée, Ludovic F.; Tardy, Blaise L.; Raymond Dagastine; John D. Orbell; Jürg A. Schutz; Duke, Mikel C.

    2016-01-01

    Advancing the design of thin-film composite membrane surfaces is one of the most promising pathways to deal with treating varying water qualities and increase their long-term stability and permeability. Although plasma technologies have been explored for surface modification of bulk micro and ultrafiltration membrane materials, the modification of thin film composite membranes is yet to be systematically investigated. Here, the performance of commercial thin-film composite desalination membra...

  11. Plasma-enhanced gasification of low-grade coals for compact power plants

    Science.gov (United States)

    Uhm, Han S.; Hong, Yong C.; Shin, Dong H.; Lee, Bong J.

    2011-10-01

    A high temperature of a steam torch ensures an efficient gasification of low-grade coals, which is comparable to that of high-grade coals. Therefore, the coal gasification system energized by microwaves can serve as a moderately sized power plant due to its compact and lightweight design. This plasma power plant of low-grade coals would be useful in rural or sparsely populated areas without access to a national power grid.

  12. Plasma kallikrein enhances platelet aggregation response by subthreshold doses of ADP.

    Science.gov (United States)

    Ottaiano, Tatiana F; Andrade, Sheila S; de Oliveira, Cleide; Silva, Mariana C C; Buri, Marcus V; Juliano, Maria A; Girão, Manoel J B C; Sampaio, Misako U; Schmaier, Alvin H; Wlodawer, Alexander; Maffei, Francisco H A; Oliva, Maria Luiza V

    2017-04-01

    Human plasma kallikrein (huPK) potentiates platelet responses to subthreshold doses of ADP, although huPK itself, does not induce platelet aggregation. In the present investigation, we observe that huPK pretreatment of platelets potentiates ADP-induced platelet activation by prior proteolysis of the G-protein-coupled receptor PAR-1. The potentiation of ADP-induced platelet activation by huPK is mediated by the integrin αIIbβ3 through interactions with the KGD/KGE sequence motif in huPK. Integrin αIIbβ3 is a cofactor for huPK binding to platelets to support PAR-1 hydrolysis that contributes to activation of the ADP signaling pathway. This activation pathway leads to phosphorylation of Src, AktS(473), ERK1/2, and p38 MAPK, and to Ca(2+) release. The effect of huPK is blocked by specific antagonists of PAR-1 (SCH 19197) and αIIbβ3 (abciximab) and by synthetic peptides comprising the KGD and KGE sequence motifs of huPK. Further, recombinant plasma kallikrein inhibitor, rBbKI, also blocks this entire mechanism. These results suggest a new function for huPK. Formation of plasma kallikrein lowers the threshold for ADP-induced platelet activation. The present observations are consistent with the notion that plasma kallikrein promotes vascular disease and thrombosis in the intravascular compartment and its inhibition may ameliorate cardiovascular disease and thrombosis. Copyright © 2017 Elsevier B.V. and Société Française de Biochimie et Biologie Moléculaire (SFBBM). All rights reserved.

  13. Crystal growth of CVD diamond and some of its peculiarities

    CERN Document Server

    Piekarczyk, W

    1999-01-01

    Experiments demonstrate that CVD diamond can form in gas environments that are carbon undersaturated with respect to diamond. This fact is, among others, the most serious violation of principles of chemical thermodynamics. In this $9 paper it is shown that none of the principles is broken when CVD diamond formation is considered not a physical process consisting in growth of crystals but a chemical process consisting in accretion of macro-molecules of polycyclic $9 saturated hydrocarbons belonging to the family of organic compounds the smallest representatives of which are adamantane, diamantane, triamantane and so forth. Since the polymantane macro-molecules are in every respect identical with $9 diamond single crystals with hydrogen-terminated surfaces, the accretion of polymantane macro- molecules is a process completely equivalent to the growth of diamond crystals. However, the accretion of macro-molecules must be $9 described in a way different from that used to describe the growth of crystals because so...

  14. Catalytic CVD of SWCNTs at Low Temperatures and SWCNT Devices

    Science.gov (United States)

    Seidel, Robert; Liebau, Maik; Unger, Eugen; Graham, Andrew P.; Duesberg, Georg S.; Kreupl, Franz; Hoenlein, Wolfgang; Pompe, Wolfgang

    2004-09-01

    New results on the planar growth of single-walled carbon nanotubes (SWCNTs) by catalytic chemical vapor deposition (CVD) at low temperatures will be reported. Optimizing catalyst, catalyst support, and growth parameters yields SWCNTs at temperatures as low as 600 °C. Growth at such low temperatures largely affects the diameter distribution since coalescence of the catalyst is suppressed. A phenomenological growth model will be suggested for CVD growth at low temperatures. The model takes into account surface diffusion and is an alternative to the bulk diffusion based vapor-liquid-solid (VLS) model. Furthermore, carbon nanotubes field effect transistors based on substrate grown SWCNTs will be presented. In these devices good contact resistances could be achieved by electroless metal deposition or metal evaporation of the contacts.

  15. CVD Diamonds in the BaBar Radiation Monitoring System

    CERN Document Server

    Bruinsma, M; Edwards, A J; Kagan, H; Kass, R; Kirkby, D; Petersen, B A

    2006-01-01

    To prevent excessive radiation damage to its Silicon Vertex Tracker, the BaBar experiment at SLAC uses a radiation monitoring and protection system that triggers a beam abort whenever radiation levels are anomalously high. The existing system, which employs large area Si PIN diodes as radiation sensors, has become increasingly difficult to operate due to radiation damage. We have studied CVD diamond sensors as a potential alternative for these silicon sensors. Two diamond sensors have been routinely used since their installation in the Vertex Tracker in August 2002. The experience with these sensors and a variety of tests in the laboratory have shown CVD diamonds to be a viable solution for dosimetry in high radiation environments. However, our studies have also revealed surprising side-effects.

  16. X-ray sensitivity measurements on CVD diamond film detectors

    Energy Technology Data Exchange (ETDEWEB)

    Foulon, F.; Pochet, T. [CEA Centre d`Etudes de Saclay, 91 - Gif-sur-Yvette (France). Dept. d`Electronique et d`Instrumentation Nucleaire; Gheeraert, E. [Centre National de la Recherche Scientifique (CNRS), 38 - Grenoble (France)

    1993-12-31

    Microwave chemical vapor deposited (CVD) diamond films have been used to fabricate radiation detectors. The polycrystalline diamond films have a resistivity of 10{sup 12} ohm.cm and carrier mobility and lifetime of about 280 cm{sup 2}/V.s and 530 ps. The detector response to laser pulses (355, 532 and 1064 nm), X-ray flux (15-50 keV) and alpha particles ({sup 241}Am, 5.49 MeV) has been investigated. The response speed of the detector is in the 100 ps range. A sensitivity of about 3 x 10{sup -10} A/V.Gy.s was measured under 50 keV X-ray flux. The detector current response to X-ray flux is almost linear. It is also shown that CVD diamond detectors can be used for alpha particle counting. (authors). 9 figs., 25 refs.

  17. Development of CVD diamond detectors for clinical dosimetry

    Science.gov (United States)

    Piliero, M. A.; Hugtenburg, R. P.; Ryde, S. J. S.; Oliver, K.

    2014-11-01

    The use of chemical vapour deposition (CVD) methods for the manufacture of diamonds could lead to detectors for high-resolution radiotherapy dosimetry that are cheaper and more reproducible than detectors based on natural diamonds. In this work two prototype designs (Diamond Detectors Ltd, Poole) of CVD diamond detectors were considered. The detectors were encapsulated in a water-proof housing in a form-factor that would be suitable for dosimetry measurements in water, as well as solid material phantoms. Stability of the dosimeter over time, the dose-response, dose-rate response and angular-response were examined. The study demonstrated that the detector behaviour conformed with theory in terms of the dose-rate response and had acceptable properties for use in the clinic.

  18. Cold Vacuum Drying (CVD) OCRWM Loop Error Determination

    Energy Technology Data Exchange (ETDEWEB)

    PHILIPP, B.L.

    2000-07-26

    Characterization is specifically identified by the Richland Operations Office (RL) for the Office of Civilian Radioactive Waste Management (OCRWM) of the US Department of Energy (DOE), as requiring application of the requirements in the Quality Assurance Requirements and Description (QARD) (RW-0333P DOE 1997a). Those analyses that provide information that is necessary for repository acceptance require application of the QARD. The cold vacuum drying (CVD) project identified the loops that measure, display, and record multi-canister overpack (MCO) vacuum pressure and Tempered Water (TW) temperature data as providing OCRWM data per Application of the Office of Civilian Radioactive Waste Management (OCRWM) Quality Assurance Requirements to the Hanford Spent Nuclear Fuel Project HNF-SD-SNF-RPT-007. Vacuum pressure transmitters (PT 1*08, 1*10) and TW temperature transmitters (TIT-3*05, 3*12) are used to verify drying and to determine the water content within the MCO after CVD.

  19. The osmotically and histamine-induced enhancement of the plasma vasopressin level is diminished by intracerebroventricularly administered orexin in rats.

    Science.gov (United States)

    Kis, Gyöngyi K; Molnár, Andor H; Daruka, Leila; Gardi, János; Rákosi, Kinga; László, Ferenc; László, Ferenc A; Varga, Csaba

    2012-04-01

    The effects of the centrally administered neuropeptides orexin-A on water intake and vasopressin (VP) secretion were studied in male Wistar rats (180-250 g). Different doses (10, 30, and 90 μg/10 μl) of the orexins and the specific orexin receptor-1 (OX(1)) antagonist SB 408124 (30 μg/10 μl) were administered intracerebroventricularly (i.c.v.) under anaesthesia, and the water consumption was measured during 6 h. A plasma VP level elevation was induced by histamine (10 mg/kg) or 2.5% NaCl (10 ml/kg) administered intraperitoneally (i.p.). The plasma VP levels were measured by radioimmunoassay. Increased water consumption was observed after the administration of 30 μg/10 μl orexin-A. There were no changes in basal VP secretion after the administration of different doses of the orexins. A significant increase in plasma VP concentration was detected following histamine administration. After 2.5% NaCl administration, there was a moderate VP level enhancement. Intracerebroventricularly administered orexin-A (30 μg/10 μl) blocked the VP level increase induced by either histamine or 2.5% NaCl administration. The inhibitory effects were prevented by the specific OX(1) receptor antagonist. In conclusion, the orexins increased water consumption. After 30 μg/10 μl orexin-A administration, the polydipsia was more pronounced. The OX(1) receptor antagonist significantly decreased the polydipsia. Histamine or hyperosmotic VP release enhancement was blocked by previously administered orexin. This inhibition was not observed following OX(1) receptor antagonist administration. Our results suggest that the effects of the orexins on water consumption or blockade of the histamine and osmosis-induced VP level increase are mediated by the OX(1) receptor.

  20. Enhancement of the life of refractories through the operational experience of plasma torch melter

    Energy Technology Data Exchange (ETDEWEB)

    Moon, Young Pyo [Technology Institute, Korea Radioactive waste Agency (KORAD), Daejeon (Korea, Republic of); Choi, Jaang Young [Chungnam National University, Daejeon (Korea, Republic of)

    2016-06-15

    The properties of wastes for melting need to be considered to minimize the maintenance of refractory and to discharge the molten slags smoothly from a plasma torch melter. When the nonflammable wastes from nuclear facilities such as concrete debris, glass, sand, etc., are melted, they become acid slags with low basicity since the chemical composition has much more acid oxides than basic oxides. A molten slag does not have good characteristics of discharge and is mainly responsible for the refractory erosion due to its low liquidity. In case of a stationary plasma torch melter with a slant tapping port on the wall, a fixed amount of molten slags remains inside of tapping hole as well as the melter inside after tapping out. Nonmetallic slags keep the temperature higher than melting point of metal because metallic slags located on the bottom of melter by specific gravity difference are simultaneously melted when dual mode plasma torch operates in transferred mode. In order to minimize the refractory erosion, the compatible refractories are selected considering the temperature inside the melter and the melting behavior of slags whether to contact or noncontact with molten slags. An acidic refractory shall not be installed in adjacent to a basic refractory for the resistibility against corrosion.

  1. Aerodynamic performance enhancement of a flying wing using nanosecond pulsed DBD plasma actuator

    Directory of Open Access Journals (Sweden)

    Han Menghu

    2015-04-01

    Full Text Available Experimental investigation of aerodynamic control on a 35° swept flying wing by means of nanosecond dielectric barrier discharge (NS-DBD plasma was carried out at subsonic flow speed of 20–40 m/s, corresponding to Reynolds number of 3.1 × 105–6.2 × 105. In control condition, the plasma actuator was installed symmetrically on the leading edge of the wing. Lift coefficient, drag coefficient, lift-to-drag ratio and pitching moment coefficient were tested with and without control for a range of angles of attack. The tested results indicate that an increase of 14.5% in maximum lift coefficient, a decrease of 34.2% in drag coefficient, an increase of 22.4% in maximum lift-to-drag ratio and an increase of 2° at stall angle of attack could be achieved compared with the baseline case. The effects of pulsed frequency, amplitude and chord Reynolds number were also investigated. And the results revealed that control efficiency demonstrated strong dependence on pulsed frequency. Moreover, the results of pitching moment coefficient indicated that the breakdown of leading edge vortices could be delayed by plasma actuator at low pulsed frequencies.

  2. The use of DBD plasma treatment and polymerization for the enhancement of biomedical UHMWPE

    Energy Technology Data Exchange (ETDEWEB)

    Cools, Pieter, E-mail: Pieter.cools@ugent.be; Van Vrekhem, Stijn; De Geyter, Nathalie; Morent, Rino

    2014-12-01

    Surface modification of polymers for biomedical applications is a thoroughly studied area. The goal of this paper is to show the use of atmospheric pressure plasma technology for the treatment of polyethylene shoulder implants. Atmospheric pressure plasma polymerization of methyl methacrylate will be performed on PE samples to increase the adhesion between the polymer and a PMMA bone cement. For the plasma polymerization, a dielectric barrier discharge is used, operating in a helium atmosphere at an ambient pressure. Parameters such as treatment time, monomer gas flow and discharge power are varied one at a time. Chemical and physical changes at the sample surface are studied making use of X-ray photoelectron spectroscopy and atomic force microscopy measurements. Coating thicknesses are determined by making use of optical reflectance spectroscopy. After characterization, the coated samples are incubated into a phosphate buffered saline solution for a minimum of one week at 37 °C, testing the coating stability when exposed to implant conditions. The results show that PMMA coatings can be deposited with a high degree of control in terms of chemical composition and layer thickness. - Highlights: • Medium pressure DBD successfully activates UHMWPE substrates. • Deposition of PMMA like film via atmospheric pressure DBD on activated UHMWPE • Fast deposition rate is confirmed via optical reflectance spectroscopy. • Relative stable coating found after tests in PBS solution and analysed via FT-IR.

  3. Activation of peroxydisulfate by gas-liquid pulsed discharge plasma to enhance the degradation of p-nitrophenol

    Science.gov (United States)

    Shang, Kefeng; Wang, Hao; Li, Jie; Lu, Na; Jiang, Nan; Wu, Yan

    2017-06-01

    Pulsed discharge in water and over water surfaces generates ultraviolet radiation, local high temperature, shock waves, and chemical reactive species, including hydroxyl radicals, hydrogen peroxide, and ozone. Pulsed discharge plasma (PDP) can oxidize and mineralize pollutants very efficiently, but high energy consumption restricts its application for industrial wastewater treatment. A novel method for improving the energy efficiency of wastewater treatment by PDP was proposed, in which peroxydisulfate (PDS) was added to wastewater and PDS was activated by PDP to produce more strong oxidizing radicals, including sulfate radicals and hydroxyl radicals, leading to a higher oxidation capacity for the PDP system. The experimental results show that the increase in solution conductivity slightly decreased the discharge power of the pulse discharge over the water surface. An increase in the discharge intensity improved the activation of PDS and therefore the degradation efficiency and energy efficiency of p-nitrophenol (PNP). An increase in the addition dosage of PDS greatly facilitated the degradation of PNP at a molar ratio of PDS to PNP of lower than 80:1, but the performance enhancement was no longer obvious at a dosage of more than 80:1. Under an applied voltage of 20 kV and a gas discharge gap of 2 mm, the degradation efficiency and energy efficiency of the PNP reached 90.7% and 45.0 mg kWh-1 for the plasma/PDS system, respectively, which was 34% and 18.0 mg kWh-1 higher than for the discharge plasma treatment alone. Analysis of the physical and chemical effects indicated that ozone and hydrogen peroxide were important for PNP degradation and UV irradiation and heat from the discharge plasma might be the main physical effects for the activation of PDS.

  4. A combination of CO{sub 2} laser and plasma surface modification of poly(etheretherketone) to enhance osteoblast response

    Energy Technology Data Exchange (ETDEWEB)

    Zheng, Yanyan [Chengdu Institute of Organic Chemistry, Chinese Academy of Sciences, Chengdu 610041 (China); University of Chinese Academy of Sciences, Beijing 100049 (China); Xiong, Chengdong [Chengdu Institute of Organic Chemistry, Chinese Academy of Sciences, Chengdu 610041 (China); Wang, Zhecun [Chengdu Institute of Organic Chemistry, Chinese Academy of Sciences, Chengdu 610041 (China); University of Chinese Academy of Sciences, Beijing 100049 (China); Li, Xiaoyu [State Key Laboratory of Oral Diseases, West China Hospital of Stomatology, Sichuan University, Chengdu 610041 (China); Zhang, Lifang, E-mail: zhanglfcioc@163.com [Chengdu Institute of Organic Chemistry, Chinese Academy of Sciences, Chengdu 610041 (China)

    2015-07-30

    Highlights: • COOH and microgrooves containing micropores or microcraters structure were constructed on PEEK surface by a combination of CO{sub 2} laser and plasma treatment. • The mechanical properties of PEEK are maintained after single or dual surface treatment. • Pre-osteoblast cells (MC3T3-E1) adhesion, spreading and proliferation were improved remarkably on dual treated PEEK surface. • Cell pseudopodia protrude into the micropores or microcraters, in favor of forming firmer bone-implant integration. - Abstract: Poly(etheretherketone) (PEEK) is a rigid semicrystalline polymer that combines excellent mechanical properties, broad chemical resistance and bone-like stiffness and is widely used in biomedical fields. However, the bio-inert surface of PEEK tends to hinder its biomedical applications when direct osteointegration between the implants and the host tissue is desired. In this work, we demonstrate a dual modification method, which combines the laser and plasma surface treatment to combine advantages of both chemical states and microstructures for osteoblasts responses. While the plasma treatment introduces surface carboxyl groups (−COOH) onto PEEK surface, the laser treatment constructs microstructures over the PEEK surface. Our results indicated that −COOH as well as microgrooves containing micropores or microcraters structure are constructed on PEEK surface and plasma treatment has no apparent effect on the morphology of microstructures produced by laser micromachining. Unexpectedly, the superior mechanical properties of PEEK were maintained irrespective of the treatment used. Compared to native PEEK and single treated PEEK, dual modified PEEK is more favorable for pre-osteoblasts (MC3T3-E1) adhesion, spreading and proliferation. Moreover, cell pseudopodia protrude into the micropores or microcraters, in favor of forming firmer bone-implant integration. Our study illustrates enhanced osteoblasts responses to dual treated PEEK surface, which

  5. Enhanced relativistic self-focusing of Hermite-cosh-Gaussian laser beam in plasma under density transition

    Energy Technology Data Exchange (ETDEWEB)

    Nanda, Vikas; Kant, Niti, E-mail: nitikant@yahoo.com [Department of Physics, Lovely Professional University, Phagwara 144411, Punjab (India)

    2014-04-15

    Enhanced and early relativistic self-focusing of Hermite-cosh-Gaussian (HChG) beam in the plasmas under density transition has been investigated theoretically using Wentzel-Kramers-Brillouin and paraxial ray approximation for mode indices m=0, 1, and 2. The variation of beam width parameter with normalized propagation distance for m=0, 1, and 2 is reported, and it is observed that strong self-focusing occurs as the HChG beam propagates deeper inside the nonlinear medium as spot size shrinks due to highly dense plasmas and the results are presented graphically. A comparative study between self-focusing of HChG beam in the presence and absence of plasmas density transition is reported. The dependency of beam width parameter on the normalized propagation distance for different values of decentered parameter “b” has also been presented graphically. For m=0 and 1, strong self-focusing is reported for b=1.8, and for m=2 and b=1.8, beam gets diffracted. The results obtained indicate the dependency of the self-focusing of the HChG beam on the selected values of decentered parameter. Moreover, proper selection of decentered parameter results strong self-focusing of HChG beam. Stronger self-focusing of laser beam is observed due to the presence of plasma density transition which might be very useful in the applications like the generation of inertial fusion energy driven by lasers, laser driven accelerators, etc.

  6. Leakage current measurements of a pixelated polycrystalline CVD diamond detector

    OpenAIRE

    Zain, R.M.; Maneuski, D.; O'Shea, V.; Bates, R.; Blue, A.; Cunnigham, L.; Stehl, C.; Berderman, E.; Rahim, R. A.

    2013-01-01

    Diamond has several desirable features when used as a material for radiation detection. With the invention of synthetic growth techniques, it has become feasible to look at developing diamond radiation detectors with reasonable surface areas. Polycrystalline diamond has been grown using a chemical vapour deposition (CVD) technique by the University of Augsburg and detector structures fabricated at the James Watt Nanofabrication Centre (JWNC) in the University of Glasgow in order to produce pi...

  7. Electrochromic behavior in CVD grown tungsten oxide films

    Science.gov (United States)

    Gogova, D.; Iossifova, A.; Ivanova, T.; Dimitrova, Zl; Gesheva, K.

    1999-03-01

    Solid state electrochemical devices (ECDs) for smart windows, large area displays and automobile rearview mirrors are of considerable technological and commercial interest. In this paper, we studied the electrochromic properties of amorphous and polycrystalline CVD carbonyl tungsten oxide films and the possibility for sol-gel thin TiO 2 film to play the role of passive electrode in an electrochromic window with solid polymer electrolyte.

  8. Electrochromic behavior in CVD grown tungsten oxide films

    Energy Technology Data Exchange (ETDEWEB)

    Gogova, D.; Iossifova, A.; Ivanova, T.; Gesheva, K.; Dimitrova, Z. [Central Laboratory for Solar Energy and New Energy Sources at Bulgarian Academy of Science, 72 Tzarigradsko shossee Blvd., Sofia (Bulgaria)

    1999-03-15

    Solid state electrochemical devices (ECDs) for smart windows, large area displays and automobile rearview mirrors are of considerable technological and commercial interest. In this paper, we studied the electrochromic properties of amorphous and polycrystalline CVD carbonyl tungsten oxide films and the possibility for sol-gel thinTiO{sub 2} film to play the role of passive electrode in an electrochromic window with solid polymer electrolyte

  9. THz-conductivity of CVD graphene on different substrates

    OpenAIRE

    Gabriel Cortés, Daniel; Sempere, Bernat; Colominas, Carles; Ferrer Anglada, Núria

    2015-01-01

    Optoelectronic properties of CVD graphene are charac-terized over a wide frequency range: THz, IR, visible and near-UV. We used Raman spectroscopy to characterize the synthesized graphene films. All graphene layers were deposited on various substrates, some ones transparent or flexible, such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), quartz and silicon. Transmission Terahertz time-domain spectroscopy (THz-TDS) method, in the range from 100 GHz to 3 THz, is used to an...

  10. Evidence relating sodium intake to blood pressure and CVD.

    Science.gov (United States)

    O'Donnell, Martin; Mente, Andrew; Yusuf, Salim

    2014-01-01

    Sodium is an essential nutrient, mostly ingested as salt (sodium chloride). Average sodium intake ranges from 3 to 6 g per day (7.5-15 g/day of salt) in most countries, with regional variations. Increasing levels of sodium intake have a positive association with higher blood pressure. Randomized controlled trials report a reduction in blood pressure with reducing sodium intake from moderate to low levels, which is the evidence that forms the basis for international guidelines recommending all people consume less than 2.0 g of sodium per day. However, no randomized trials have demonstrated that reducing sodium leads to a reduction in cardiovascular disease (CVD). In their absence, the next option is to examine the association between sodium consumption and CVD in prospective cohort studies. Several recent prospective cohort studies have indicated that while high intake of sodium (>6 g/d) is associated with higher risk of CVD compared to those with moderate intake (3 to 5 g/d), lower intake (<3 g/day) is also associated with a higher risk (despite lower blood pressure levels). However, most of these studies were conducted in populations at increased risk of cardiovascular disease. Current epidemiologic evidence supports that an optimal level of sodium intake is in the range of about 3-5 g/day, as this range is associated with lowest risk of CVD in prospective cohort studies. Randomized controlled trials, comparing the effect of low sodium intake to moderate intake on incidence of cardiovascular events and mortality, are required to truly define optimal intake range.

  11. High plasma cholesteryl ester transfer but not CETP mass predicts incident cardiovascular disease : A nested case control study

    NARCIS (Netherlands)

    Kappelle, Paul J.W.H.; Perton, Frank; Hillege, Hans L.; Dallinga-Thie, Geesje M.; Dullaart, Robin P. F.

    Objective: The relationship of cardiovascular disease (CVD) with plasma cholesteryl ester transfer protein (CETP) levels is controversial. We determined whether plasma cholesteryl ester transfer (CET), reflecting CETP-mediated transfer of cholesteryl esters from endogenous HDL towards apolipoprotein

  12. Method for generating a highly reactive plasma for exhaust gas after treatment and enhanced catalyst reactivity

    Energy Technology Data Exchange (ETDEWEB)

    Whealton, John H.; Hanson, Gregory R.; Storey, John M.; Raridon, Richard J.; Armfield, Jeffrey S.; Bigelow, Timothy S.; Graves, Ronald L.

    2000-07-01

    This patent application describes a method and apparatus of exhaust gas remediation that enhance the reactivity of the material catalysts found within catalytic converters of cars, trucks, and power stations.

  13. Infrared spectroscopic study of carrier scattering in gated CVD graphene

    Science.gov (United States)

    Yu, Kwangnam; Kim, Jiho; Kim, Joo Youn; Lee, Wonki; Hwang, Jun Yeon; Hwang, E. H.; Choi, E. J.

    2016-12-01

    We measured Drude absorption of gated CVD graphene using far-infrared transmission spectroscopy and determined the carrier scattering rate (γ ) as a function of the varied carrier density (n ). The n -dependent γ (n ) was obtained for a series of conditions systematically changed as (10 K, vacuum) → (300 K, vacuum) → (300 K, ambient pressure), which reveals that (1) at low-T, charged impurity (=A /√{n } ) and short-range defect (=B √{n } ) are the major scattering sources which constitute the total scattering γ =A /√{n }+B √{n } , (2) among various kinds of phonons populated at room-T , surface polar phonon of the SiO2 substrate is the dominantly scattering source, and (3) in air, the gas molecules adsorbed on graphene play a dual role in carrier scattering as charged impurity center and resonant scattering center. We present the absolute scattering strengths of those individual scattering sources, which provides the complete map of scattering mechanism of CVD graphene. This scattering map allows us to find out practical measures to suppress the individual scatterings, the mobility gains accompanied by them, and finally the ultimate attainable carrier mobility for CVD graphene.

  14. Mass production of CNTs using CVD multi-quartz tubes

    Energy Technology Data Exchange (ETDEWEB)

    Yousef, Samy; Mohamed, Alaa [Dept. of Production Engineering and Printing Technology, Akhbar Elyom Academy, Giza (Egypt)

    2016-11-15

    Carbon nanotubes (CNTs) have become the backbone of modern industries, including lightweight and heavy-duty industrial applications. Chemical vapor deposition (CVD) is considered as the most common method used to synthesize high yield CNTs. This work aims to develop the traditional CVD for the mass production of more economical CNTs, meeting the growing CNT demands among consumers by increasing the number of three particular reactors. All reactors housing is connected by small channels to provide the heat exchange possibility between the chambers, thereby decreasing synthesis time and reducing heat losses inside the ceramic body of the furnace. The novel design is simple and cheap with a lower reacting time and heat loss compared with the traditional CVD design. Methane, hydrogen, argon, and catalyzed iron nanoparticles were used as a carbon source and catalyst during the synthesis process. In addition, CNTs were produced using only a single quartz tube for comparison. The produced samples were examined using XRD, TEM, SEM, FTIR, and TGA. The results showed that the yield of CNTs increases by 287 % compared with those synthesized with a single quartz tube. Moreover, the total synthesis time of CNTs decreases by 37 % because of decreased heat leakage.

  15. Ultra-high Burst Strength of CVD Graphene Membranes

    Science.gov (United States)

    Wang, Luda; Boutilier, Michael; Kidambi, Piran; Karnik, Rohit; Microfluidics; Nanofluidics Research Lab Team

    2015-11-01

    Porous graphene membranes have significant potential in gas separation, water desalination and nanofiltration. Understanding the mechanical strength of porous graphene is crucial because membrane separations can involve high pressures. We studied the burst strength of CVD graphene membrane placed on porous support at applied pressures up to 100 bar by monitoring the gas flow rate across the membrane as a function of pressure. Increase of gas flow rate with pressure allowed for extraction of the burst fraction of graphene as it failed under increasing pressure. We also studied the effect of sub-nanometer pores on the ability of graphene to withstand pressure. The results showed that porous graphene membranes can withstand pressures comparable to or even higher than the >50 bar pressures encountered in water desalination, with non-porous CVD graphene exhibiting even higher mechanical strength. Our study shows that porous polycrystalline CVD graphene has ultra-high burst strength under applied pressure, suggesting the possibility for its use in high-pressure membrane separations. Principal Investigator

  16. Approach to diabetes management in patients with CVD.

    Science.gov (United States)

    Lathief, Sanam; Inzucchi, Silvio E

    2016-02-01

    Epidemiologic analyses have established a clear association between diabetes and macrovascular disease. Vascular dysfunction caused by metabolic abnormalities in patients with diabetes is associated with accelerated atherosclerosis and increased risk of myocardial infarction (MI), stroke, and peripheral arterial disease. Patients with diabetes are at two to four fold higher CV risk as compared to non-diabetic individuals, and CVD remains the leading cause of mortality in patients with this condition. One strategy to reduce CVD burden in patients with diabetes has been to focus on controlling the major metabolic abnormality in this condition, namely hyperglycemia. However, this has not been unequivocally demonstrated to reduced CV events, in contrast to controlling other CVD risk factors linked to hyperglycemia, such as blood pressure, dyslipidemia, and platelet dysfunction. However, In contradistinction, accrued data from a number of large, randomized clinical trials in both type 1 (T1DM) and type 2 diabetes (T2DM) over the past 3 decades have proven that more intensive glycemic control retards the onset and progression of microvascular disease. In this review, we will summarize the key glucose-lowering CV outcomes trials in diabetes, provide an overview of the different drugs and their impact on the CV system, and describe our approach to management of the frequently encountered patient with T2DM and coronary artery disease (CAD) and/or heart failure (HF).

  17. Surface properties of diamond-like carbon films prepared by CVD and PVD methods

    Institute of Scientific and Technical Information of China (English)

    Liu Dong-Ping; Liu Yan-Hong; Chen Bao-Xiang

    2006-01-01

    Diamond-like carbon (DLC) films have been deposited using three different techniques: (a) electron cyclotron resonance-plasma source ion implantation, (b) low-pressure dielectric barrier discharge, (c) filtered-pulsed cathodic arc discharge. The surface and mechanical properties of these films are compared using atomic force microscopebased tests. The experimental results show that hydrogenated DLC films are covered with soft surface layers enriched with hydrogen and sp3 hybridized carbon while the soft surface layers of tetrahedral amorphous carbon (ta-C) films have graphite-like structure. The formation of soft surface layers can be associated with the surface diffusion and growth induced by the low-energy deposition process. For typical CVD methods, the atomic hydrogen in the plasmas can contribute to the formation of hydrogen and sp3 hybridized carbon enriched surface layers. The high-energy ion implantation causes the rearrangement of atoms beneath the surface layer and leads to an increase in film density. The ta-C films can be deposited using the medium energy carbon ions in the highly-ionized plasma.

  18. Kinetics of low pressure CVD growth of SiO2 on InP and Si

    Science.gov (United States)

    Iyer, R.; Lile, D. L.

    1988-01-01

    The kinetics of low pressure CVD growth of SiO2 from SiH4 and O2 has been investigated for the case of an indirect (remote) plasma process. Homogeneous (gas phase) and heterogeneous operating ranges have been experimentally identified. The process was shown to be consistent within the heterogeneous surface-reaction dominated range of operation. A kinetic rate equation is given for growth at 14 W RF power input and 400 mtorr total pressure on both InP and Si substrates. The process exhibits an activation energy of 8.4 + or - 0.6 kcal/mol.

  19. A novel Mo-W interlayer approach for CVD diamond deposition on steel

    Directory of Open Access Journals (Sweden)

    Vojtěch Kundrát

    2015-04-01

    Full Text Available Steel is the most widely used material in engineering for its cost/performance ratio and coatings are routinely applied on its surface to further improve its properties. Diamond coated steel parts are an option for many demanding industrial applications through prolonging the lifetime of steel parts, enhancement of tool performance as well as the reduction of wear rates. Direct deposition of diamond on steel using conventional chemical vapour deposition (CVD processes is known to give poor results due to the preferential formation of amorphous carbon on iron, nickel and other elements as well as stresses induced from the significant difference in the thermal expansion coefficients of those materials. This article reports a novel approach of deposition of nanocrystalline diamond coatings on high-speed steel (M42 substrates using a multi-structured molybdenum (Mo – tungsten (W interlayer to form steel/Mo/Mo-W/W/diamond sandwich structures which overcome the adhesion problem related to direct magnetron sputtering deposition of pure tungsten. Surface, interface and tribology properties were evaluated to understand the role of such an interlayer structure. The multi-structured Mo-W interlayer has been proven to improve the adhesion between diamond films and steel substrates by acting as an effective diffusion barrier during the CVD diamond deposition.

  20. Surface Study of Carbon Nanotubes Prepared by Thermal-CVD of Camphor Precursor

    Science.gov (United States)

    Azira, A. A.; Rusop, M.

    2010-03-01

    Surface morphology study on the influence of starting carbon materials by using thermal chemical vapor deposition (Thermal-CVD) to produced carbon nanotubes (CNTs) is investigated. The CNTs derived from camphor were synthesized as the precursor material due to low sublimation temperature, which indirectly maybe cost effective. The major parameters are also evaluated in order to obtain high-yield and high-quality CNTs. The prepared CNTs are examined using field emission scanning electron microscopy (FESEM) and high resolution transmission electron microscope (HR-TEM) to determine the microstructure of nanocarbons. The FESEM investigation of the CNTs formed on the support catalysts provides evidence that camphor is suitable as a precursor material for nanotubes formation. The high-temperature graphitization process induced by the Thermal-CVD enables the hydrocarbons to act as carbon sources and changes the aromatic species into the layered graphite structure of CNTs. The camphoric hydrocarbons not only found acts as the precursors but also enhances the production rate and the quality of CNTs.