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Sample records for planar magnetron discharge

  1. Axisymmetrical particle-in-cell/Monte Carlo simulation of narrow gap planar magnetron plasmas. I. Direct current-driven discharge

    International Nuclear Information System (INIS)

    Kondo, Shuji; Nanbu, Kenichi

    2001-01-01

    An axisymmetrical particle-in-cell/Monte Carlo simulation is performed for modeling direct current-driven planar magnetron discharge. The axisymmetrical structure of plasma parameters such as plasma density, electric field, and electron and ion energy is examined in detail. The effects of applied voltage and magnetic field strength on the discharge are also clarified. The model apparatus has a narrow target-anode gap of 20 mm to make the computational time manageable. This resulted in the current densities which are very low compared to actual experimental results for a wider target-anode gap. The current-voltage characteristics show a negative slope in contrast with many experimental results. However, this is understandable from Gu and Lieberman's similarity equation. The negative slope appears to be due to the narrow gap

  2. Geometrical aspects of a hollow-cathode planar magnetron

    International Nuclear Information System (INIS)

    Wang, Z.; Cohen, S.A.

    1999-01-01

    A hollow-cathode planar magnetron (HCPM), built by surrounding a planar sputtering-magnetron cathode with a hollow-cathode structure (HCS) [Z. Wang and S. A. Cohen, J. Vac. Sci. Technol. A 17, 77 (1999)], is operable at substantially lower pressures than its planar-magnetron counterpart. HCPM operational parameters depend on the inner diameter D and length L of its cylindrical HCS. Only when L is greater than L 0 , a critical length, is the HCPM operable in the new low-pressure regime. The critical length varies with HCS inner diameter D. Explanations of the lower operational pressure regime, critical length, and plasma shape are proposed and compared with a one-dimension diffusion model for energetic electron transport. At pressures above 1 mTorr, Bohm diffusion (temperature congruent primary electron energy), with an ambipolar constraint, can explain the ion - electron pair creation required to sustain the discharge. At the lowest pressure, ∼0.3 mTorr, collision-limited diffusion creates fewer ion - electron pairs than required for steady state and therefore cannot explain the experimental data. The critical length L 0 is consistent with the magnetization length of the primary electrons. copyright 1999 American Institute of Physics

  3. Stability of Brillouin flow in planar, conventional, and inverted magnetrons

    International Nuclear Information System (INIS)

    Simon, D. H.; Lau, Y. Y.; Greening, G.; Wong, P.; Gilgenbach, R. M.; Hoff, B. W.

    2015-01-01

    The Brillouin flow is the prevalent flow in crossed-field devices. We systematically study its stability in the conventional, planar, and inverted magnetron geometry. To investigate the intrinsic negative mass effect in Brillouin flow, we consider electrostatic modes in a nonrelativistic, smooth bore magnetron. We found that the Brillouin flow in the inverted magnetron is more unstable than that in a planar magnetron, which in turn is more unstable than that in the conventional magnetron. Thus, oscillations in the inverted magnetron may startup faster than the conventional magnetron. This result is consistent with simulations, and with the negative mass property in the inverted magnetron configuration. Inclusion of relativistic effects and electromagnetic effects does not qualitatively change these conclusions

  4. High-current magnetron discharge with magnetic insulation of anode

    International Nuclear Information System (INIS)

    Bizyukov, A.A.; Sereda, K.N.; Sleptsov, V.V.

    2008-01-01

    In magnetron discharge at currents higher then critical which magnitude is in the range of 15...30 A the transition from glow discharge in transverse magnetic field to arc discharge occurs. In the present time the problem of arc blowout is solved at the expense of pulse and HF power supply applying. In this paper the alternative method of limiting current of magnetron discharge increasing at the expense of increasing of discharge gap resistance by means of additional anode layer transverse magnetic field and arc current interruption by sectioning of current collector of anode surface is carrying out

  5. Arc-discharge and magnetron sputtering combined equipment for nanocomposite coating deposition

    International Nuclear Information System (INIS)

    Koval, N.N.; Borisov, D.P.; Savostikov, V.M.

    2005-01-01

    It is known that characteristics of nanocomposite coatings produced by reactive magnetron sputtering undergo an essential influence on the following parameters such as original component composition of targets being sputtered, as well as abundance ratio of such components in the coatings deposited, relative content of inert and reactionary gases in a gas mixture used and a value of operating pressure in a chamber, substrate temperature, and a value of substrate bias potential, determining energy of ionized atoms, ionized atoms flow density, i.e. ion current density on a substrate. The multifactor character of production process of nanocomposite coatings with certain physical and mechanical properties demands a purposeful and complex control on all above-mentioned parameters. To solve such a problem, an arc-discharge and magnetron sputtering combined equipment including a vacuum chamber of approximately ∼ 0.5 m 3 with a built-in low-pressure plasma generator made on the basis of non-self-sustained discharge with a thermal cathode and a planar magnetron combined with two sputtered targets has been created. Construction of such a complex set-up provides both an autonomous mode of operation and simultaneous operation of an arc plasma generator and magnetron sputtering system. Magnetron sputtering of either one or two targets simultaneously is provided as well. An arc plasma generator enables ions current density control on a substrate in a wide range due to discharge current varying from 1 to 100 A. Energy of ions is also being controlled in a wide range by a negative bias potential from 0 to 1000 V applied to a substrate. The wide control range of gas plasma density of a arc discharge of approximately 10 9 -10 11 cm -3 and high uniformity of its distribution over the total volume of an operating chamber (about 15% error with regard to the mean value) provides a purposeful and simultaneous control either of magnetron discharge characteristics (operating pressure of

  6. Metal doped fluorocarbon polymer films prepared by plasma polymerization using an RF planar magnetron target

    International Nuclear Information System (INIS)

    Biederman, H.; Holland, L.

    1983-01-01

    Fluorocarbon films have been prepared by plasma polymerization of CF 4 using an RF planar magnetron with an aluminium target. More than one order of magnitude higher deposition rate has been achieved in comparison with an r.f. diode system operated under similar conditions of monomer pressure and flow rate and power input. A glow discharge in a CF 4 [25%]-argon[75%] mixture was used to incorporate aluminium from a target electrode into the polymer films. The foregoing mixture and another based on CF 4 [87%]-argon[13%] were used in the RF discharge with a copper target. Some experiments with a gold target and pure CF 4 as the inlet gas were also made. The film structure was examined by SEM and TEM and characteristic micrographs are presented here. The composition of the films was estimated from an EAS study. The sheet resistivity of the metal/polymer film complexes was determined. (orig.)

  7. A Compact, Pi-Mode Extraction Scheme for the Axial B-Field Recirculating Planar Magnetron

    Science.gov (United States)

    2012-07-23

    Figure 4). Thus, in a planar magnetron, the minimum phase velocity, vph , to stay above cutoff in the rectangular waveguide is ℎ = ...as magnetrons, electrons must be accelerated such that they are in synchronism with the phase velocity, vph , of the electromagnetic wave for an

  8. Mass spectrometry investigation of magnetron sputtering discharges

    Czech Academy of Sciences Publication Activity Database

    Pokorný, Petr; Musil, Jindřich; Lančok, Ján; Fitl, Přemysl; Novotný, Michal; Bulíř, Jiří; Vlček, Jan

    2017-01-01

    Roč. 143, č. 6 (2017), s. 438-443 ISSN 0042-207X R&D Projects: GA MŠk LO1409; GA MŠk LM2015088; GA TA ČR(CZ) TA03010490; GA ČR GA17-13427S Institutional support: RVO:68378271 Keywords : mass spectrometry * atoms * radicals and ions * RF discharge * contamination * metallic films Subject RIV: BM - Solid Matter Physics ; Magnetism OBOR OECD: Condensed matter physics (including formerly solid state physics, supercond.) Impact factor: 1.530, year: 2016

  9. Metal doped fluorocarbon polymer films prepared by plasma polymerization using an RF planar magnetron target

    Energy Technology Data Exchange (ETDEWEB)

    Biederman, H.; Holland, L. (Sussex Univ., Brighton (UK). Lab. for Plasma Materials Processing)

    1983-07-01

    Fluorocarbon films have been prepared by plasma polymerization of CF/sub 4/ using an RF planar magnetron with an aluminium target. More than one order of magnitude higher deposition rate has been achieved in comparison with an R.F. diode system operated under similar conditions of monomer pressure and flow rate and power input. A glow discharge in a CF/sub 4/(25%)-argon(75%) mixture was used to incorporate aluminium from a target electrode into the polymer films. The foregoing mixture and another based on CF/sub 4/(87%)-argon(13%) were used in the RF discharge with a copper target. Some experiments with a gold target and pure CF/sub 4/ as the inlet gas were also made. The film structure was examined by SEM and TEM and characteristic micrographs are presented here. The composition of the films was estimated from an EAS study. The sheet resistivity of the metal/polymer film complexes was determined.

  10. Nitrogen Atom Energy Distributions in a Hollow-cathode Planar Sputtering Magnetron

    International Nuclear Information System (INIS)

    Ruzic, D.N.; Goeckner, M.J.; Cohen, S.A.; Wang, Zhehui

    1999-01-01

    Energy distributions of N atoms in a hollow-cathode planar sputtering magnetron were obtained by use of optical emission spectroscopy. A characteristic line, N I 8216.3 , well-separated from molecular nitrogen emission bands, was identified. Jansson's nonlinear spectral deconvolution method, refined by minimization of χ w ampersand sup2; , was used to obtain the optimal deconvolved spectra. These showed nitrogen atom energies from 1 eV to beyond 500 eV. Based on comparisons with VFTRIM results, we propose that the energetic N atoms are generated from N 2 + ions after these ions are accelerated through the sheath and dissociatively reflect from the cathode

  11. Combined optical emission and resonant absorption diagnostics of an Ar-O{sub 2}-Ce-reactive magnetron sputtering discharge

    Energy Technology Data Exchange (ETDEWEB)

    El Mel, A.A. [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Institut des Matériaux Jean Rouxel, Université de Nantes, CNRS, 2 rue de la Houssinière B.P. 32229, Nantes Cedex 3 44322 (France); Ershov, S. [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Britun, N., E-mail: nikolay.britun@umons.ac.be [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Ricard, A. [Université de Toulouse, UPS, INPT, LAPLACE (Laboratoire Plasma et Conversion d' Energie), 118 route de Narbonne, Toulouse Cedex 9 F-31062 (France); Konstantinidis, S. [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Snyders, R. [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Materia Nova Research Center, Parc Initialis, Avenue Copernic 1, Mons B-7000 (Belgium)

    2015-01-01

    We report the results on combined optical characterization of Ar-O{sub 2}-Ce magnetron sputtering discharges by optical emission and resonant absorption spectroscopy. In this study, a DC magnetron sputtering system equipped with a movable planar magnetron source with a Ce target is used. The intensities of Ar, O, and Ce emission lines, as well as the absolute densities of Ar metastable and Ce ground state atoms are analyzed as a function of the distance from the magnetron target, applied DC power, O{sub 2} content, etc. The absolute number density of the Ar{sup m} is found to decrease exponentially as a function of the target-to-substrate distance. The rate of this decrease is dependent on the sputtering regime, which should be due to the different collisional quenching rates of Ar{sup m} by O{sub 2} molecules at different oxygen contents. Quantitatively, the absolute number density of Ar{sup m} is found to be equal to ≈ 3 × 10{sup 8} cm{sup −3} in the metallic, and ≈ 5 × 10{sup 7} cm{sup −3} in the oxidized regime of sputtering, whereas Ce ground state densities at the similar conditions are found to be few times lower. The absolute densities of species are consistent with the corresponding deposition rates, which decrease sharply during the transition from metallic to poisoned sputtering regime. - Highlights: • Optical emission and resonant absorption spectroscopy are employed to study Ar-O{sub 2}-Ce magnetron sputtering discharges. • The density of argon metastables is found to decrease exponentially when increasing the target-to-substrate distance. • The collision-quenching rates of Ar{sup m} by O{sub 2} molecules at different oxygen contents is demonstrated. • The deposition rates of cerium and cerium oxide thin films decrease sharply during the transition from the metallic to the poisoned sputtering regime.

  12. Discharge Characteristic of VHF-DC Superimposed Magnetron Sputtering System

    Science.gov (United States)

    Toyoda, Hirotaka; Fukuoka, Yushi; Fukui, Takashi; Takada, Noriharu; Sasai, Kensuke

    2014-10-01

    Magnetron plasmas are one of the most important tools for sputter deposition of thin films. However, energetic particles from the sputtered target such as backscattered rare gas atoms or oxygen negative ions from oxide targets sometimes induce physical and chemical damages as well as surface roughening to the deposited film surface during the sputtering processes. To suppress kinetic energy of such particles, superposition of RF or VHF power to the DC power has been investigated. In this study, influence of the VHF power superposition on the DC target voltage, which is important factor to determine kinetic energy of high energy particles, is investigated. In the study, 40 MHz VHF power was superimposed to an ITO target and decrease in the target DC voltage was measured as well as deposited film deposition properties such as deposition rate or electrical conductivity. From systematic measurement of the target voltage, it was revealed that the target voltage can be determined by a very simple parameter, i.e., a ratio of VHF power to the total input power (DC and VHF powers) in spite of the DC discharge current. Part of this work was supported by ASTEP, JST.

  13. CH₃NH₃PbI₃-based planar solar cells with magnetron-sputtered nickel oxide.

    Science.gov (United States)

    Cui, Jin; Meng, Fanping; Zhang, Hua; Cao, Kun; Yuan, Huailiang; Cheng, Yibing; Huang, Feng; Wang, Mingkui

    2014-12-24

    Herein we report an investigation of a CH3NH3PbI3 planar solar cell, showing significant power conversion efficiency (PCE) improvement from 4.88% to 6.13% by introducing a homogeneous and uniform NiO blocking interlayer fabricated with the reactive magnetron sputtering method. The sputtered NiO layer exhibits enhanced crystallization, high transmittance, and uniform surface morphology as well as a preferred in-plane orientation of the (200) plane. The PCE of the sputtered-NiO-based perovskite p-i-n planar solar cell can be further promoted to 9.83% when a homogeneous and dense perovskite layer is formed with solvent-engineering technology, showing an impressive open circuit voltage of 1.10 V. This is about 33% higher than that of devices using the conventional spray pyrolysis of NiO onto a transparent conducting glass. These results highlight the importance of a morphology- and crystallization-compatible interlayer toward a high-performance inverted perovskite planar solar cell.

  14. Operational limit of a planar DC magnetron cluster source due to target erosion

    International Nuclear Information System (INIS)

    Rai, A.; Mutzke, A.; Bandelow, G.; Schneider, R.; Ganeva, M.; Pipa, A.V.; Hippler, R.

    2013-01-01

    The binary collision-based two dimensional SDTrimSP-2D model has been used to simulate the erosion process of a Cu target and its influence on the operational limit of a planar DC magnetron nanocluster source. The density of free metal atoms in the aggregation region influences the cluster formation and cluster intensity during the target lifetime. The density of the free metal atoms in the aggregation region can only be predicted by taking into account (i) the angular distribution of the sputtered flux from the primary target source and (ii) relative downwards shift of the primary source of sputtered atoms during the erosion process. It is shown that the flux of the sputtered atoms smoothly decreases with the target erosion

  15. Time-resolved investigation of an asymmetric bipolar pulsed magnetron deposition discharge: Influence of pressure

    NARCIS (Netherlands)

    Dunger, Th.; Welzel, Th.; Welzel, S.; Richter, F.

    2005-01-01

    A bipolar pulsed magnetron deposition discharge has been studied with pulse frequencies of 100 and 150 kHz, respectively. The discharge was operated in an argon/oxygen mixture at different total pressures with a circular magnesium target as cathode. Time-resolved Langmuir double probe measurements

  16. Blue Diode Laser Absorption Spectroscopy of Pulsed Magnetron Discharge

    Czech Academy of Sciences Publication Activity Database

    Olejníček, Jiří; Do, H.T.; Hubička, Zdeněk; Hippler, R.; Jastrabík, Lubomír

    2006-01-01

    Roč. 45, 10B (2006), s. 8090-8094 ISSN 0021-4922 R&D Projects: GA AV ČR 1QS100100563; GA ČR GA202/05/2242 Institutional research plan: CEZ:AV0Z10100521; CEZ:AV0Z10100520 Keywords : laser absorption spectroscopy * pulsed magnetron * sputtering parameters Subject RIV: BH - Optics, Masers, Lasers Impact factor: 1.222, year: 2006

  17. Analysis of conditions for magnetron discharge initiation at vacuum camera testing

    International Nuclear Information System (INIS)

    Tzeneva, Raina; Dineff, Peter; Darjanova, Denitza

    2002-01-01

    Models of electric field distribution for two typical cases of vacuum camera internal pressure control are investigated. New relations between the maximum magnetron discharge current value I max and the maximum electric field strength radial component value E τ max are established. (Author)

  18. Examination of the radiation of magnetron discharge in the process of spraying thin films

    International Nuclear Information System (INIS)

    Sokolov, V.F.; Sokolova, Yu.A.; Protasevich, A.A.

    1999-01-01

    In this work, we investigated the light radiation of the magnetron discharge in order to develop a method of spectral control and regulation of the process of deposition of thin films in UVN-25 industrial equipment used for metallising of superlarge integrated circuits and other components

  19. RHEED oscillations in spinel ferrite epitaxial films grown by conventional planar magnetron sputtering

    Science.gov (United States)

    Ojima, T.; Tainosho, T.; Sharmin, S.; Yanagihara, H.

    2018-04-01

    Real-time in situ reflection high energy electron diffraction (RHEED) observations of Fe3O4, γ-Fe2O3, and (Co,Fe)3O4 films on MgO(001) substrates grown by a conventional planar magnetron sputtering was studied. The change in periodical intensity of the specular reflection spot in the RHEED images of three different spinel ferrite compounds grown by two different sputtering systems was examined. The oscillation period was found to correspond to the 1/4 unit cell of each spinel ferrite, similar to that observed in molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) experiments. This suggests that the layer-by-layer growth of spinel ferrite (001) films is general in most physical vapor deposition (PVD) processes. The surfaces of the films were as flat as the surface of the substrate, consistent with the observed layer-by-layer growth process. The observed RHEED oscillation indicates that even a conventional sputtering method can be used to control film thickness during atomic layer depositions.

  20. RHEED oscillations in spinel ferrite epitaxial films grown by conventional planar magnetron sputtering

    Directory of Open Access Journals (Sweden)

    T. Ojima

    2018-04-01

    Full Text Available Real-time in situ reflection high energy electron diffraction (RHEED observations of Fe3O4, γ-Fe2O3, and (Co,Fe3O4 films on MgO(001 substrates grown by a conventional planar magnetron sputtering was studied. The change in periodical intensity of the specular reflection spot in the RHEED images of three different spinel ferrite compounds grown by two different sputtering systems was examined. The oscillation period was found to correspond to the 1/4 unit cell of each spinel ferrite, similar to that observed in molecular beam epitaxy (MBE and pulsed laser deposition (PLD experiments. This suggests that the layer-by-layer growth of spinel ferrite (001 films is general in most physical vapor deposition (PVD processes. The surfaces of the films were as flat as the surface of the substrate, consistent with the observed layer-by-layer growth process. The observed RHEED oscillation indicates that even a conventional sputtering method can be used to control film thickness during atomic layer depositions.

  1. Investigation of the time evolution of plasma parameters in a pulsed magnetron discharge

    Czech Academy of Sciences Publication Activity Database

    Straňák, V.; Hubička, Zdeněk; Adámek, P.; Blažek, J.; Tichý, M.; Špatenka, P.; Hippler, R.; Wrehde, S.

    2006-01-01

    Roč. 56, - (2006), s. 1364-1370 ISSN 0011-4626 R&D Projects: GA ČR GA202/05/2242; GA ČR GA202/06/0776 Grant - others:Deutsche Forschungsgemeinschaft(DE) SFB/TR 24 Institutional research plan: CEZ:AV0Z10100522 Keywords : pulsed magnetron * time resolved measurements * Langmuir probe Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 0.568, year: 2006

  2. Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina

    Czech Academy of Sciences Publication Activity Database

    Pokorný, Petr; Bulíř, Jiří; Lančok, Ján; Musil, Jindřich; Novotný, Michal

    2010-01-01

    Roč. 7, č. 11 (2010), s. 910-914 ISSN 1612-8850 R&D Projects: GA AV ČR IAA100100718; GA AV ČR KAN400100653; GA ČR GP202/09/P324 Institutional research plan: CEZ:AV0Z10100522 Keywords : aluminium oxide * ion-energy distribution function * magnetron * mass spectrometry * pulsed discharges Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.643, year: 2010

  3. Planar UV excilamp excited by a surface barrier discharge

    Energy Technology Data Exchange (ETDEWEB)

    Guivan, N N [Department of Quantum Electronics, Uzhgorod National University, Pidgirna 46, Uzhgorod 88000 (Ukraine); Janca, J [Department of Physical Electronics, Masaryk University, Kotlarska 2, Brno 61137 (Czech Republic); Brablec, A [Department of Physical Electronics, Masaryk University, Kotlarska 2, Brno 61137 (Czech Republic); Stahel, P [Department of Physical Electronics, Masaryk University, Kotlarska 2, Brno 61137 (Czech Republic); SlavIcek, P [Department of Physical Electronics, Masaryk University, Kotlarska 2, Brno 61137 (Czech Republic); Shimon, L L [Department of Quantum Electronics, Uzhgorod National University, Pidgirna 46, Uzhgorod 88000 (Ukraine)

    2005-09-07

    In this paper, the typical characteristics of a planar excilamp based on KrCl* and XeCl* exciplex molecules are presented. The excitation of the working mixture Kr/Xe/Cl{sub 2} is realized by means of the surface barrier discharge at pressures of 0.1-1 bar. The following properties are measured and discussed: spectra emitted by the plasma in the UV/VIS/NIR spectral range, intensity of emitted light versus total pressure in the discharge, the composition of the working mixture and the power of emitted light. The radiation power versus input electric power, and space distribution of the emitted light including basic electrical parameters of the discharge were also measured. It was shown that the characteristic power of UV radiation emitted in the spectral range 200-400 nm is about 6 mW cm{sup -2} while the efficiency could be about 8%.

  4. Magnetron sputtering system with an annual discharge zone and two cathode modules

    International Nuclear Information System (INIS)

    Savich, V. A.; Yasyunas, A. A.; Kovrigo, V. M.; Kotov, D. A.; Shiripov, V. Ya.

    2013-01-01

    In this article, general discharge characteristics of a cylindrical magnetron sputtering system with an annual sputtering zone and a high target usage coefficient designed for transparent conducting coatings are shown. Two coupled DC-cathodes are used to improve coating uniformity. Radial sputtered material fluxes are being created. The engineered magnetic system is extremely balanced (G-factor is much higher than 2) and thus provides maximal effective operating power higher than 6 kW. The effectiveness of a magnetic trap results in a fast work cycle (less than 1.5 min) and a high target material usage coefficient (higher than 40%). A multipole magnetic field with null magnetic flux density zones lower target’s surface is being created. There is an influence between cathode modules despite mutual magnetic isolation, so magnetic conductors-shunts are used to weaken it. The magnetron can be used to sputter both metals and conducting ceramics (including ITO). (authors)

  5. Increase in the accuracy of approximating the profile of the erosion zone in planar magnetrons

    Science.gov (United States)

    Rogov, A. V.; Kapustin, Yu. V.

    2017-09-01

    It has been shown that the use of the survival function of the Weibull distribution shifted along the ordinate axis allows one to increase the accuracy of the approximation of the normalized profile of an erosion zone in the area from the axis to the maximum sputtering region compared with the previously suggested distribution function of the extremum values. The survival function of the Weibull distribution is used in the area from the maximum to the outer boundary of an erosion zone. The major advantage of using the new approximation is observed for magnetrons with a large central nonsputtered spot and for magnetrons with substantial sputtering in the paraxial zone.

  6. Boundary Effect of Planar Glow Dielectric Barrier Discharge and Its Influence on the Discharge Structure

    International Nuclear Information System (INIS)

    Xu Shaowei; Li Lulu; Ouyang Jiting

    2015-01-01

    The dielectric barrier discharge (DBD) in the glow regime in neon has been investigated by experiment and two-dimensional (2D) fluid modeling. The discharge was carried out in a planar DBD system with segmented-electrodes driven by square-wave voltage. The results show that the glow DBD originates in the center of the electrode and expands outward to the electrode edge during each half cycle of the voltage, forming a radial structure. The discharge decays firstly in the inner area but sustains longer in the edge area, showing a reversed discharge area. The discharge cannot completely cover the entire electrode surface, but remains a border of non- or weak discharge. The fluid modeling shows a similar result in agreement with the experiments. The simulations indicate that the electric field in the edge area is distorted due to the boundary effect so that the electric field and charge distribution are different from that in the inner part. The distorted field reduces the longitudinal component near the edge and causes the local field to be lower than that in the center, and hence makes the discharge behindhand. It also induces a transverse field that makes the discharge extend radially outward to the edge. The boundary effect plays an important role in the glow DBD structure. (paper)

  7. Magnetron sputtered zinc oxide nanorods as thickness-insensitive cathode interlayer for perovskite planar-heterojunction solar cells.

    Science.gov (United States)

    Liang, Lusheng; Huang, Zhifeng; Cai, Longhua; Chen, Weizhong; Wang, Baozeng; Chen, Kaiwu; Bai, Hua; Tian, Qingyong; Fan, Bin

    2014-12-10

    Suitable electrode interfacial layers are essential to the high performance of perovskite planar heterojunction solar cells. In this letter, we report magnetron sputtered zinc oxide (ZnO) film as the cathode interlayer for methylammonium lead iodide (CH3NH3PbI3) perovskite solar cell. Scanning electron microscopy and X-ray diffraction analysis demonstrate that the sputtered ZnO films consist of c-axis aligned nanorods. The solar cells based on this ZnO cathode interlayer showed high short circuit current and power conversion efficiency. Besides, the performance of the device is insensitive to the thickness of ZnO cathode interlayer. Considering the high reliability and maturity of sputtering technique both in lab and industry, we believe that the sputtered ZnO films are promising cathode interlayers for perovskite solar cells, especially in large-scale production.

  8. A Rectangular Planar Spiral Antenna for GIS Partial Discharge Detection

    Directory of Open Access Journals (Sweden)

    Xiaoxing Zhang

    2014-01-01

    Full Text Available A rectangular planar spiral antenna sensor was designed for detecting the partial discharge in gas insulation substations (GIS. It can expediently receive electromagnetic waves leaked from basin-type insulators and can effectively suppress low frequency electromagnetic interference from the surrounding environment. Certain effective techniques such as rectangular spiral structure, bow-tie loading, and back cavity structure optimization during the antenna design process can miniaturize antenna size and optimize voltage standing wave ratio (VSWR characteristics. Model calculation and experimental data measured in the laboratory show that the antenna possesses a good radiating performance and a multiband property when working in the ultrahigh frequency (UHF band. A comparative study between characteristics of the designed antenna and the existing quasi-TEM horn antenna was made. Based on the GIS defect simulation equipment in the laboratory, partial discharge signals were detected by the designed antenna, the available quasi-TEM horn antenna, and the microstrip patch antenna, and the measurement results were compared.

  9. Experimental investigation of plasma dynamics in dc and short-pulse magnetron discharges

    International Nuclear Information System (INIS)

    Seo, Sang-Hun; In, Jung-Hwan; Chang, Hong-Young

    2006-01-01

    The spatiotemporal evolution of the electron energy distribution function (EEDF) and of plasma parameters such as the electron density, the electron temperature and the plasma and floating potentials has been investigated using spatially and temporally resolved single Langmuir probe measurements in dc and mid-frequency, short-pulse magnetron discharges with a repetition frequency of 10 kHz and a duty cycle of 10%. In the pulsed discharge of the short duty cycle, a peak electron temperature higher than 10 eV was observed near the cathode fall region during the early phase of the pulse-on, which is about three times higher than the steady-state value of the electron temperature in the dc discharge. The temporal evolution of the measured EEDFs showed the initial efficient electron heating during the early phase of the pulse-on and the subsequent relaxation of electron energy by the inelastic collisions and the diffusive loss. The high-energy electrons generated during the pulse-on phase diffused the downstream region toward the grounded substrate, resulting in a bi-Maxwellian EEDF consisting of the background low-energy electrons and the high-energy electrons. The results of the spatially and temporally resolved probe measurements will be presented and the enhanced efficiency of the electron heating in the short-pulse discharge will be explained on the basis of the global model of a pulsed discharge

  10. A study of the transient plasma potential in a pulsed bi-polar dc magnetron discharge

    International Nuclear Information System (INIS)

    Bradley, J W; Karkari, S K; Vetushka, A

    2004-01-01

    The temporal evolution of the plasma potential, V p , in a pulsed dc magnetron plasma has been determined using the emissive probe technique. The discharge was operated in the 'asymmetric bi-polar' mode, in which the discharge voltage changes polarity during part of the pulse cycle. The probe measurements, with a time-resolution of 20 ns or better, were made along a line above the racetrack, normal to the plane of the cathode target, for a fixed frequency (100 kHz), duty cycle (50%), argon pressure (0.74 Pa) and discharge power (583 W). At all the measured positions, V p was found to respond to the large and rapid changes in the cathode voltage, V d , during the different phases of the pulse cycle, with V p always more positive than V d . At a typical substrate position (>80 mm from the target), V p remains a few volts above the most positive surface in the discharge at all times. In the 'on' phase of the pulse, the measurements show a significant axial electric field is generated in the plasma, with the plasma potential dropping by a total of about 30 V over a distance of 70 mm, from the bulk plasma to a position close to the beginning of the cathode fall. This is consistent with measurements made in the dc magnetron. During the stable 'reverse' phase of the discharge, for distances greater than 18 mm from the target, the axial electric field is found to collapse, with V p elevated uniformly to about 3 V above V d . Between the target and this field-free region an ion sheath forms, and the current flowing to the target is still an ion current in this 'reverse' period. During the initial 200 ns of the voltage 'overshoot' phase (between 'on' and 'reverse' phases), V d reached a potential of +290 V; however, close to the target, V p was found to attain a much higher value, namely +378 V. Along the line of measurement, the axial electric field reverses in direction in this phase, and an electron current of up to 9 A flows to the target. The spatial and temporal

  11. Rotating dust ring in an RF discharge coupled with a dc-magnetron sputter source. Experiment and simulation

    International Nuclear Information System (INIS)

    Matyash, K; Froehlich, M; Kersten, H; Thieme, G; Schneider, R; Hannemann, M; Hippler, R

    2004-01-01

    During an experiment involving coating of dust grains trapped in an RF discharge using a sputtering dc-magnetron source, a rotating dust ring was observed and investigated. After the magnetron was switched on, the dust cloud levitating above the RF electrode formed a ring rotating as a rigid body. Langmuir probe diagnostics were used for the measurement of plasma density and potential. It was discovered that the coupling of the dc-magnetron source to the RF discharge causes steep radial gradients in electron density and plasma potential. The rotation of the dust ring is attributed to the azimuthal component of the ion drag force, which appears due to the azimuthal drift of the ions caused by crossed radial electric and axial magnetic fields. In order to get more insight into the mechanism of dust ring rotation, a Particle-in-Cell simulation of a rotating dust cloud was performed. The results of the experiment and simulation are presented and discussed

  12. Rotating dust ring in an RF discharge coupled with a dc-magnetron sputter source. Experiment and simulation

    Energy Technology Data Exchange (ETDEWEB)

    Matyash, K [Institut fuer Niedertemperaturplasmaphysik Greifswald, Fr.-L.-Jahn-Strasse 19, 17489 Greifswald (Germany); Froehlich, M [Institut fuer Physik, Ernst-Moritz-Arndt-Universitaet Greifswald, Domstrasse 10a, 17487 Greifswald (Germany); Kersten, H [Institut fuer Niedertemperaturplasmaphysik Greifswald, Fr.-L.-Jahn-Strasse 19, 17489 Greifswald (Germany); Thieme, G [Institut fuer Physik, Ernst-Moritz-Arndt-Universitaet Greifswald, Domstrasse 10a, 17487 Greifswald (Germany); Schneider, R [Max-Planck-Institut fuer Plasmaphysik, Teilinstitut Greifswald, Wendelsteinstrasse 1, 17489 Greifswald (Germany); Hannemann, M [Institut fuer Niedertemperaturplasmaphysik Greifswald, Fr.-L.-Jahn-Strasse 19, 17489 Greifswald (Germany); Hippler, R [Institut fuer Physik, Ernst-Moritz-Arndt-Universitaet Greifswald, Domstrasse 10a, 17487 Greifswald (Germany)

    2004-10-07

    During an experiment involving coating of dust grains trapped in an RF discharge using a sputtering dc-magnetron source, a rotating dust ring was observed and investigated. After the magnetron was switched on, the dust cloud levitating above the RF electrode formed a ring rotating as a rigid body. Langmuir probe diagnostics were used for the measurement of plasma density and potential. It was discovered that the coupling of the dc-magnetron source to the RF discharge causes steep radial gradients in electron density and plasma potential. The rotation of the dust ring is attributed to the azimuthal component of the ion drag force, which appears due to the azimuthal drift of the ions caused by crossed radial electric and axial magnetic fields. In order to get more insight into the mechanism of dust ring rotation, a Particle-in-Cell simulation of a rotating dust cloud was performed. The results of the experiment and simulation are presented and discussed.

  13. Heating of polymer substrate by discharge plasma in radiofrequency magnetron sputtering deposition

    International Nuclear Information System (INIS)

    Sirghi, Lucel; Popa, Gheorghe; Hatanaka, Yoshinori

    2006-01-01

    The substrate used for the thin film deposition in a radiofrequency magnetron sputtering deposition system is heated by the deposition plasma. This may change drastically the surface properties of the polymer substrates. Deposition of titanium dioxide thin films on polymethyl methacrylate and polycarbonate substrates resulted in buckling of the substrate surfaces. This effect was evaluated by analysis of atomic force microscopy topography images of the deposited films. The amount of energy received by the substrate surface during the film deposition was determined by a thermal probe. Then, the results of the thermal probe measurements were used to compute the surface temperature of the polymer substrate. The computation revealed that the substrate surface temperature depends on the substrate thickness, discharge power and substrate holder temperature. For the case of the TiO 2 film depositions in the radiofrequency magnetron plasma, the computation indicated substrate surface temperature values under the polymer melting temperature. Therefore, the buckling of polymer substrate surface in the deposition plasma may not be regarded as a temperature driven surface instability, but more as an effect of argon ion bombardment

  14. Composite Ag/C:H:N films prepared by planar magnetron deposition

    Energy Technology Data Exchange (ETDEWEB)

    Hlidek, P. [Charles University, Faculty of Mathematics and Physics, Praha (Czech Republic)], E-mail: hlidek@karlov.mff.cuni.cz; Hanus, J.; Biederman, H.; Slavinska, D.; Pesicka, J. [Charles University, Faculty of Mathematics and Physics, Praha (Czech Republic)

    2008-05-30

    Composite Ag/C:H:N films were deposited by means of an unbalanced magnetron operated in a gas mixture of nitrogen and n-hexane. Composition of the films was controlled by electric power delivered to the magnetron and by ratio of nitrogen and n-hexane in the working gas mixture. The films were characterized using transmission electron microscopy, by the absorption spectra in visible and near infrared regions and by Fourier transform infrared spectroscopy. Immediately after film deposition and without breaking vacuum (in situ) corresponding vibration infrared spectra were scanned and their evolution during ageing of the films was monitored. Wettability as determined from water contact angle was improved with raising nitrogen contents, i.e. with increasing the electric power and the ratio of nitrogen/n-hexane in the working gas mixture. The increased wettability is likely caused by presence of NH{sub x} groups in Ag/C:H:N films. The incorporation of nitrogen effectively prevents the formation of carboxylate groups on the silver inclusions surfaces during the aging in the open air. In addition, the oxidation mechanism of the polymer matrix is modified.

  15. Electrical properties of indium-tin oxide films deposited on nonheated substrates using a planar-magnetron sputtering system and a facing-targets sputtering system

    International Nuclear Information System (INIS)

    Iwase, Hideo; Hoshi, Youichi; Kameyama, Makoto

    2006-01-01

    Distribution of the electrical properties of indium-tin oxide (ITO) film prepared by both a planar-magnetron sputtering system (PMSS) and a facing-targets sputtering system (FTSS) at room temperature were investigated. It was found that the outstanding non-uniformities of the electrical properties in noncrystalline ITO films are mainly due to the variation of the oxygen stoichiometry dependent on film positions on substrate surfaces. Furthermore, ITO film with uniform distribution of electrical properties was obtainable using FTSS

  16. Plasma kinetics of Ar/O2 magnetron discharge by two-dimensional multifluid modeling

    International Nuclear Information System (INIS)

    Costin, C.; Minea, T. M.; Popa, G.; Gousset, G.

    2010-01-01

    Multifluid two-dimensional model was developed to describe the plasma kinetics of the direct current Ar/O 2 magnetron, coupling two modules: charged particles and neutrals. The first module deals with three positive ions - Ar + , O 2 + , and O + - and two negative species - e - and O - - treated by the moments of Boltzmann's equation. The second one follows seven neutral species (Ar, O 2 , O, O 3 , and related metastables) by the multicomponent diffusion technique. The two modules are self-consistently coupled by the mass conservation and kinetic coefficients taking into account more than 100 volume reactions. The steady state is obtained when the overall convergence is achieved. Calculations for 10%O 2 in Ar/O 2 mixture at 2.67 and 4 Pa show that the oxygen excited species are mainly created by electron collisions in the negative glow of the discharge. Decreasing the pressure down to 0.67 Pa, the model reveals the nonlocal behavior of the reactive species. The density gradient of O 2 ground state is reversed with respect to all gradients of the other reactive species, since the latter ones originate from the molecular ground state of oxygen. It is also found that the wall reactions drastically modify the space gradient of neutral reactive species, at least as much as the pressure, even if the discharge operates in compound mode.

  17. Plasma kinetics of Ar/O{sub 2} magnetron discharge by two-dimensional multifluid modeling

    Energy Technology Data Exchange (ETDEWEB)

    Costin, C.; Minea, T. M.; Popa, G.; Gousset, G. [LPGP, UMR 8578, CNRS-Paris-Sud XI University, Bat. 210, Orsay Cedex 91405, France and Faculty of Physics, Al. I. Cuza University, 11 Carol I Blvd., Iasi 700506 (Romania); LPGP, UMR 8578, CNRS-Paris-Sud XI University, Bat. 210, Orsay Cedex 91405 (France); Faculty of Physics, Al. I. Cuza University, 11 Carol I Blvd., Iasi 700506 (Romania); LPGP, UMR 8578, CNRS-Paris-Sud XI University, Bat. 210, Orsay Cedex 91405 (France)

    2010-03-15

    Multifluid two-dimensional model was developed to describe the plasma kinetics of the direct current Ar/O{sub 2} magnetron, coupling two modules: charged particles and neutrals. The first module deals with three positive ions - Ar{sup +}, O{sub 2}{sup +}, and O{sup +} - and two negative species - e{sup -} and O{sup -} - treated by the moments of Boltzmann's equation. The second one follows seven neutral species (Ar, O{sub 2}, O, O{sub 3}, and related metastables) by the multicomponent diffusion technique. The two modules are self-consistently coupled by the mass conservation and kinetic coefficients taking into account more than 100 volume reactions. The steady state is obtained when the overall convergence is achieved. Calculations for 10%O{sub 2} in Ar/O{sub 2} mixture at 2.67 and 4 Pa show that the oxygen excited species are mainly created by electron collisions in the negative glow of the discharge. Decreasing the pressure down to 0.67 Pa, the model reveals the nonlocal behavior of the reactive species. The density gradient of O{sub 2} ground state is reversed with respect to all gradients of the other reactive species, since the latter ones originate from the molecular ground state of oxygen. It is also found that the wall reactions drastically modify the space gradient of neutral reactive species, at least as much as the pressure, even if the discharge operates in compound mode.

  18. Discharge runaway in high power impulse magnetron sputtering of carbon: the effect of gas pressure, composition and target peak voltage

    Science.gov (United States)

    Vitelaru, Catalin; Aijaz, Asim; Constantina Parau, Anca; Kiss, Adrian Emil; Sobetkii, Arcadie; Kubart, Tomas

    2018-04-01

    Pressure and target voltage driven discharge runaway from low to high discharge current density regimes in high power impulse magnetron sputtering of carbon is investigated. The main purpose is to provide a meaningful insight of the discharge dynamics, with the ultimate goal to establish a correlation between discharge properties and process parameters to control the film growth. This is achieved by examining a wide range of pressures (2–20 mTorr) and target voltages (700–850 V) and measuring ion saturation current density at the substrate position. We show that the minimum plasma impedance is an important parameter identifying the discharge transition as well as establishing a stable operating condition. Using the formalism of generalized recycling model, we introduce a new parameter, ‘recycling ratio’, to quantify the process gas recycling for specific process conditions. The model takes into account the ion flux to the target, the amount of gas available, and the amount of gas required for sustaining the discharge. We show that this parameter describes the relation between the gas recycling and the discharge current density. As a test case, we discuss the pressure and voltage driven transitions by changing the gas composition when adding Ne into the discharge. We propose that standard Ar HiPIMS discharges operated with significant gas recycling do not require Ne to increase the carbon ionization.

  19. Two-dimensional spatial survey of the plasma potential and electric field in a pulsed bipolar magnetron discharge

    International Nuclear Information System (INIS)

    Vetushka, A.; Karkari, S.K.; Bradley, J.W.

    2004-01-01

    Emissive and Langmuir probe techniques have been used to obtain two-dimensional (2D) spatial maps of the plasma potential V p , electric field E, and ion trajectories in a pulsed bipolar magnetron discharge. The magnetron was pulsed at a frequency of 100 kHz, with a 50% duty cycle and operated at an argon pressure of 0.74 Pa. The pulse wave form was characterized by three distinct phases: the 'overshoot', 'reverse', and 'on' phases. In the 'on' phase of the pulse, when the cathode voltage is driven to -670 V, the 2D spatial distribution of V p has a similar form to that in dc magnetron, with significant axial and radial electric fields in the bulk plasma, accelerating ions to the sheath edge above the cathode racetrack region. During the 'overshoot' phase (duration 200 ns), V p is raised to values greater than +330 V, more than 100 V above the cathode potential, with E pointing away from the target. In the 'reverse' phase V p has a value of +45 V at all measured positions, 2 V more positive than the target potential. In this phase there is no electric field present in the plasma. In the bulk of the plasma, the results from Langmuir probe and the emissive probe are in good agreement, however, in one particular region of the plasma outside the radius of the cathode, the emissive probe measurements are consistently more positive (up to 45 V in the 'on' time). This discrepancy is discussed in terms of the different frequency response of the probes and their perturbation of the plasma. A simple circuit model of the plasma-probe system has been proposed to explain our results. A brief discussion of the effect of the changing plasma potential distribution on the operation of the magnetron is given

  20. Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge

    Directory of Open Access Journals (Sweden)

    Kavitha A.

    2017-02-01

    Full Text Available The present paper describes the effect of target power on the properties of Ti thin films prepared by DC magnetron sputtering with (triode mode and without (diode mode supported discharge. The traditional diode magnetron sputtering with an addition of a hot filament has been used to sustain the discharge at a lower pressure. The effect of target power (60, 80, 100 and 120 W on the physical properties of Ti thin films has been studied in diode and triode modes. XRD studies showed that the Ti thin films prepared at a target power up to 100 W in diode mode were amorphous in nature. The Ti thin films exhibited crystalline structure at much lower target power of 80 W with a preferred orientation along (0 0 2 plane. The grain size of Ti thin films prepared in triode mode increased from 64 nm to 80 nm, whereas in diode mode, the grain size increased from 2 nm to 5 nm. EDAX analysis confirmed that the incorporation of reactive gases was lower in triode mode compared to diode mode. The electrical resistivity of Ti thin films deposited in diode mode was found to be 85 µΩ⋅cm (target power 120 W. The electrical resistivity of Ti thin films in triode mode was found to be deceased to 15.2 µΩ⋅cm (target power 120 W.

  1. Observation of a periodic runaway in the reactive Ar/O2 high power impulse magnetron sputtering discharge

    Directory of Open Access Journals (Sweden)

    Seyedmohammad Shayestehaminzadeh

    2015-11-01

    Full Text Available This paper reports the observation of a periodic runaway of plasma to a higher density for the reactive discharge of the target material (Ti with moderate sputter yield. Variable emission of secondary electrons, for the alternating transition of the target from metal mode to oxide mode, is understood to be the main reason for the runaway occurring periodically. Increasing the pulsing frequency can bring the target back to a metal (or suboxide mode, and eliminate the periodic transition of the target. Therefore, a pulsing frequency interval is defined for the reactive Ar/O2 discharge in order to sustain the plasma in a runaway-free mode without exceeding the maximum power that the magnetron can tolerate.

  2. Simulation of the electric potential and plasma generation coupling in magnetron sputtering discharges

    Science.gov (United States)

    Trieschmann, Jan; Krueger, Dennis; Schmidt, Frederik; Brinkmann, Ralf Peter; Mussenbrock, Thomas

    2016-09-01

    Magnetron sputtering typically operated at low pressures below 1 Pa is a widely applied deposition technique. For both, high power impulse magnetron sputtering (HiPIMS) as well as direct current magnetron sputtering (dcMS) the phenomenon of rotating ionization zones (also referred to as spokes) has been observed. A distinct spatial profile of the electric potential has been associated with the latter, giving rise to low, mid, and high energy groups of ions observed at the substrate. The adherent question of which mechanism drives this process is still not fully understood. This query is approached using Monte Carlo simulations of the heavy particle (i.e., ions and neutrals) transport consistently coupled to a pre-specified electron density profile via the intrinsic electric field. The coupling between the plasma generation and the electric potential, which establishes correspondingly, is investigated. While the system is observed to strive towards quasi-neutrality, distinct mechanisms governing the shape of the electric potential profile are identified. This work is supported by the German Research Foundation (DFG) in the frame of the transregional collaborative research centre TRR 87.

  3. A global plasma model for reactive deposition of compound films by modulated pulsed power magnetron sputtering discharges

    Science.gov (United States)

    Zheng, B. C.; Wu, Z. L.; Wu, B.; Li, Y. G.; Lei, M. K.

    2017-05-01

    A spatially averaged, time-dependent global plasma model has been developed to describe the reactive deposition of a TiAlSiN thin film by modulated pulsed power magnetron sputtering (MPPMS) discharges in Ar/N2 mixture gas, based on the particle balance and the energy balance in the ionization region, and considering the formation and erosion of the compound at the target surface. The modeling results show that, with increasing the N2 partial pressure from 0% to 40% at a constant working pressure of 0.3 Pa, the electron temperature during the strongly ionized period increases from 4 to 7 eV and the effective power transfer coefficient, which represents the power fraction that effectively heats the electrons and maintains the discharge, increases from about 4% to 7%; with increasing the working pressure from 0.1 to 0.7 Pa at a constant N2 partial pressure of 25%, the electron temperature decreases from 10 to 4 eV and the effective power transfer coefficient decreases from 8% to 5%. Using the modeled plasma parameters to evaluate the kinetic energy of arriving ions, the ion-to-neutral flux ratio of deposited species, and the substrate heating, the variations of process parameters that increase these values lead to an enhanced adatom mobility at the target surface and an increased input energy to the substrate, corresponding to the experimental observation of surface roughness reduction, the microstructure transition from the columnar structure to the dense featureless structure, and the enhancement of phase separation. At higher N2 partial pressure or lower working pressure, the modeling results demonstrate an increase in electron temperature, which shifts the discharge balance of Ti species from Ti+ to Ti2+ and results in a higher return fraction of Ti species, corresponding to the higher Al/Ti ratio of deposited films at these conditions. The modeling results are well correlated with the experimental observation of the composition variation and the microstructure

  4. Pulsed dc self-sustained magnetron sputtering

    International Nuclear Information System (INIS)

    Wiatrowski, A.; Posadowski, W. M.; Radzimski, Z. J.

    2008-01-01

    The magnetron sputtering has become one of the commonly used techniques for industrial deposition of thin films and coatings due to its simplicity and reliability. At standard magnetron sputtering conditions (argon pressure of ∼0.5 Pa) inert gas particles (necessary to sustain discharge) are often entrapped in the deposited films. Inert gas contamination can be eliminated during the self-sustained magnetron sputtering (SSS) process, where the presence of the inert gas is not a necessary requirement. Moreover the SSS process that is possible due to the high degree of ionization of the sputtered material also gives a unique condition during the transport of sputtered particles to the substrate. So far it has been shown that the self-sustained mode of magnetron operation can be obtained using dc powering (dc-SSS) only. The main disadvantage of the dc-SSS process is its instability related to random arc formation. In such case the discharge has to be temporarily extinguished to prevent damaging both the magnetron source and power supply. The authors postulate that pulsed powering could protect the SSS process against arcs, similarly to reactive pulsed magnetron deposition processes of insulating thin films. To put this concept into practice, (i) the high enough plasma density has to be achieved and (ii) the type of pulsed powering has to be chosen taking plasma dynamics into account. In this article results of pulsed dc self-sustained magnetron sputtering (pulsed dc-SSS) are presented. The planar magnetron equipped with a 50 mm diameter and 6 mm thick copper target was used during the experiments. The maximum target power was about 11 kW, which corresponded to the target power density of ∼560 W/cm 2 . The magnetron operation was investigated as a function of pulse frequency (20-100 kHz) and pulse duty factor (50%-90%). The discharge (argon) extinction pressure level was determined for these conditions. The plasma emission spectra (400-410 nm range) and deposition

  5. Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges

    Czech Academy of Sciences Publication Activity Database

    Straňák, V.; Hubička, Zdeněk; Čada, Martin; Drache, S.; Tichý, M.; Hippler, R.

    2014-01-01

    Roč. 115, č. 15 (2014), "153301-1"-"153301-7" ISSN 0021-8979 R&D Projects: GA MŠk LH12043 Grant - others:AV ČR(CZ) M100101215 Institutional support: RVO:68378271 Keywords : electron-impact ionization * physical vapor-deposition * cross-sections * plasma parameters * rate coefficients * low-pressure * energy * atoms * films * ions Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 2.183, year: 2014

  6. Niobium films produced by magnetron sputtering using an Ar-He mixture as discharge gas

    CERN Document Server

    Schucan, G M; Calatroni, Sergio

    1995-01-01

    Superconducting RF accelerating cavities have been produced at CERN by sputter-coating, with a thin niobium layer, cavities made of copper. In the present work, the discharge behaviour and niobium film properties have been investigated when part of the argon sputtering gas is replaced with helium. Helium is chosen because of its low mass, which reduces the energy lost by the niobium atoms colliding with the sputter gas atoms. The higher niobium atom energy should lead to higher adatom mobility on the substrate and, hence, to a larger grain size, a feature which is highly desirable to reduce the cavity surface resistance. It has been found that helium addition effectively helps to maintain the discharge at considerably lower argon pressures, via metastable-neutral ionisation and high secondary electron yield. However, a large amount of helium is trapped in the film, amount which is proportional to the helium partial pressure during the discharge, resulting in a reduction of both Residual Resistivity Ratio and ...

  7. The importance of an external circuit in a particle-in-cell/Monte Carlo collisions model for a direct current planar magnetron

    International Nuclear Information System (INIS)

    Bultinck, E.; Kolev, I.; Bogaerts, A.; Depla, D.

    2008-01-01

    In modeling direct current (dc) discharges, such as dc magnetrons, a current-limiting device is often neglected. In this study, it is shown that an external circuit consisting of a voltage source and a resistor is inevitable in calculating the correct cathode current. Avoiding the external circuit can cause the current to converge (if at all) to a wrong volt-ampere regime. The importance of this external circuit is studied by comparing the results with those of a model without current-limiting device. For this purpose, a 2d3v particle-in-cell/Monte Carlo collisions model was applied to calculate discharge characteristics, such as cathode potential and current, particle fluxes and densities, and potential distribution in the plasma. It is shown that the calculated cathode current is several orders of magnitude lower when an external circuit is omitted, leading to lower charged particle fluxes and densities, and a wider plasma sheath. Also, it was shown, that only simulations with external circuit can bring the cathode current into a certain plasma regime, which has its own typical properties. In this work, the normal and abnormal regimes were studied

  8. Diagnostics of a negative hydrogen ion source based on a planar-coil inductively-driven discharge

    International Nuclear Information System (INIS)

    Lishev, Stiliyan St.; Shivarova, Antonia P.; Iordanov, Dimitar I.; Todorov, Dimitar T.; Demerdzhiev, Angel P.

    2013-01-01

    Recent activity on a volume-production negative-hydrogen-ion source with the design of a matrix of small-radius discharges inductively driven by a planar coil is reported. A single discharge of the matrix has been studied by employing probe-and laser-photodetachment diagnostics. The measurements have been carried out in the first - small-size - chamber of a two-chamber discharge vessel, with rf power introduced by a planar coil positioned on its front wall. The measured profiles of the negative ion density show strong axial dependence, with two maxima located at the positions corresponding to the maxima of the dc potential, where the maxima of the electron density are also located. The first maximum is in the vicinity of the rf power input and the second one is close to the interface between the two chambers of the discharge vessel.

  9. Study on the effect of hydrogen addition on the variation of plasma parameters of argon-oxygen magnetron glow discharge for synthesis of TiO2 films

    Directory of Open Access Journals (Sweden)

    Partha Saikia

    2016-04-01

    Full Text Available We report the effect of hydrogen addition on plasma parameters of argon-oxygen magnetron glow discharge plasma in the synthesis of H-doped TiO2 films. The parameters of the hydrogen-added Ar/O2 plasma influence the properties and the structural phases of the deposited TiO2 film. Therefore, the variation of plasma parameters such as electron temperature (Te, electron density (ne, ion density (ni, degree of ionization of Ar and degree of dissociation of H2 as a function of hydrogen content in the discharge is studied. Langmuir probe and Optical emission spectroscopy are used to characterize the plasma. On the basis of the different reactions in the gas phase of the magnetron discharge, the variation of plasma parameters and sputtering rate are explained. It is observed that the electron and heavy ion density decline with gradual addition of hydrogen in the discharge. Hydrogen addition significantly changes the degree of ionization of Ar which influences the structural phases of the TiO2 film.

  10. Mass spectrometric characterizations of ions generated in RF magnetron discharges during sputtering of silver in Ne, Ar, Kr and Xe gases

    Czech Academy of Sciences Publication Activity Database

    Pokorný, D.; Novotný, Michal; Musil, Jindřich; Fitl, Přemysl; Bulíř, Jiří; Lančok, Ján

    2013-01-01

    Roč. 10, č. 7 (2013), s. 593-602 ISSN 1612-8850 R&D Projects: GA ČR(CZ) GAP108/11/1298; GA ČR(CZ) GAP108/11/1312; GA ČR(CZ) GAP108/11/0958 Grant - others:AVČR(CZ) M100101271 Institutional support: RVO:68378271 Keywords : double charge ions * mass spectrometry * noble gas * RF magnetron discharges * silver * single charge ions Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 2.964, year: 2013

  11. Geometrical Aspects of a Hollow-cathode Magnetron (HCM)

    International Nuclear Information System (INIS)

    Cohen, Samuel A.; Wang, Zhehui

    1998-01-01

    A hollow-cathode magnetron (HCM), built by surrounding a planar sputtering-magnetron cathode with a hollow-cathode structure (HCS), is operable at substantially lower pressures than its planar-magnetron counterpart. We have studied the dependence of magnetron operational parameters on the inner diameter D and length L of a cylindrical HCS. Only when L is greater than L sub zero, a critical length, is the HCM operable in the new low-pressure regime. The critical length varies with HCS inner diameter D. Explanations of the lower operational pressure regime, critical length, and plasma shape are proposed and compared with a one-dimension diffusion model for energetic or primary electron transport. At pressures above 1 mTorr, an electron-impact ionization model with Bohm diffusion at a temperature equivalent to one-half the primary electron energy and with an ambipolar constraint can explain the ion-electron pair creation required to sustain the discharge. The critical length L sub zero is determined by the magnetization length of the primary electrons

  12. Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges

    Czech Academy of Sciences Publication Activity Database

    Straňák, V.; Wulff, H.; Bogdanowicz, R.; Drache, S.; Hubička, Zdeněk; Čada, Martin; Tichý, M.; Hippler, R.

    2011-01-01

    Roč. 64, 2-3 (2011), 427-435 ISSN 1434-6060 R&D Projects: GA ČR(CZ) GAP205/11/0386; GA ČR GP202/09/P159; GA AV ČR KAN301370701; GA MŠk(CZ) 1M06002 Grant - others:AVČR(CZ) M100100915 Institutional research plan: CEZ:AV0Z10100522 Keywords : dual magnetron * Ti-Cu film * HiPIMS * diagnostics * ion energy Subject RIV: BH - Optics, Masers, Lasers Impact factor: 1.476, year: 2011

  13. Geometric considerations in magnetron sputtering

    International Nuclear Information System (INIS)

    Thornton, J.A.

    1982-01-01

    The recent development of high performance magnetron type discharge sources has greatly enhaced the range of coating applications where sputtering is a viable deposition process. Magnetron sources can provide high current densities and sputtering rates, even at low pressures. They have much reduced substrate heating rates and can be scaled to large sizes. Magnetron sputter coating apparatuses can have a variety of geometric and plasma configurations. The target geometry affects the emission directions of both the sputtered atoms and the energetic ions which are neutralized and reflected at the cathode. This fact, coupled with the long mean free particle paths which are prevalent at low pressures, can make the coating properties very dependent on the apparatus geometry. This paper reviews the physics of magnetron operation and discusses the influences of apparatus geometry on the use of magnetrons for rf sputtering and reactive sputtering, as well as on the microstructure and internal stresses in sputtered metallic coatings. (author) [pt

  14. Resonance hairpin and Langmuir probe-assisted laser photodetachment measurements of the negative ion density in a pulsed dc magnetron discharge

    Energy Technology Data Exchange (ETDEWEB)

    Bradley, James W.; Dodd, Robert; You, S.-D.; Sirse, Nishant; Karkari, Shantanu Kumar [Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool (United Kingdom); National Centre for Plasma Science and Technology, Dublin City University, Dublin 9, Republic of Ireland (Ireland); National Centre for Plasma Science and Technology, Dublin City University, Dublin 9, Republic of Ireland and Institute for Plasma Research, Bhat Gandhinagar, Gujarat (India)

    2011-05-15

    The time-resolved negative oxygen ion density n{sub -} close to the center line in a reactive pulsed dc magnetron discharge (10 kHz and 50% duty cycle) has been determined for the first time using a combination of laser photodetachment and resonance hairpin probing. The discharge was operated at a power of 50 W in 70% argon and 30% oxygen gas mixtures at 1.3 Pa pressure. The results show that the O{sup -} density remains pretty constant during the driven phase of the discharge at values typically below 5x10{sup 14} m{sup -3}; however, in the off-time, the O{sup -} density grows reaching values several times those in the on-time. This leads to the negative ion fraction (or degree of electronegativity) {alpha}=n{sub -}/n{sub e} being higher in the off phase (maximum value {alpha}{approx}1) than in the on phase ({alpha}=0.05-0.3). The authors also see higher values of {alpha} at positions close to the magnetic null than in the more magnetized region of the plasma. This fractional increase in negative ion density during the off-phase is attributed to the enhanced dissociative electron attachment of highly excited oxygen molecules in the cooling plasma. The results show that close to the magnetic null the photodetached electron density decays quickly after the laser pulse, followed by a slow decay over a few microseconds governed by the negative ion temperature. However, in the magnetized regions of the plasma, this decay is more gradual. This is attributed to the different cross-field transport rates for electrons in these two regions. The resonance hairpin probe measurements of the photoelectron densities are compared directly to photoelectron currents obtained using a conventional Langmuir probe. There is good agreement in the general trends, particularly in the off-time.

  15. Pressure dependence of Ar.sup.+./sup..sub.2./sub., ArTi.sup.+./sup., and Ti.sup.+./sup..sub.2./sub. dimer formation in a magnetron sputtering discharge

    Czech Academy of Sciences Publication Activity Database

    Hippler, R.; Čada, Martin; Straňák, V.; Hubička, Zdeněk; Helm, C.A.

    2017-01-01

    Roč. 50, č. 44 (2017), s. 1-8, č. článku 445205. ISSN 0022-3727 R&D Projects: GA ČR GA17-08389S Institutional support: RVO:68378271 Keywords : magnetron sputtering * ion mass spectrometry * dimer formation * cluster formation Subject RIV: BL - Plasma and Gas Discharge Physics OBOR OECD: Fluids and plasma physics (including surface physics) Impact factor: 2.588, year: 2016

  16. Nmr and esr studies on a-Si/sub 1-x/Ge/sub x/:H films prepared by glow discharge and magnetron sputtering

    International Nuclear Information System (INIS)

    Shimizu, T.; Kumeda, M.; Morimoto, A.; Tsujimura, Y.; Kobayashi, I.

    1986-01-01

    Properties of a-Si/sub 1-x/Ge/sub x/:H films prepared by magnetron sputtering (MG) and glow discharge decomposition (GD) were compared by means of NMR, ESR, IR and hydrogen-evolution measurements. For MG films, the content of dispersed H is roughly independent of x while the content of clustered H decreases with x. For GD films, both the contents of dispersed and clustered H decrease with x. ESR results reveal that most defects in the films are Ge dangling bonds and that the number of dangling bonds per Ge atom is roughly independent of x for MG films whereas it increases largely with x for GD films. The ratio of the intensity of the IR peak at 2100 cm/sup -1/ to that at 2000 cm/sup -1/ decreases and increases with x, respectively, for MG and GD films, and the ratio of the intensity of the low temperature H evolution peak to that of the high temperature H evolution peak decreases and increases with x, respectively for MG and GD films

  17. Spatially hybrid computations for streamer discharges with generic features of pulled fronts: I. Planar fronts

    International Nuclear Information System (INIS)

    Li Chao; Ebert, Ute; Hundsdorfer, Willem

    2010-01-01

    Streamers are the first stage of sparks and lightning; they grow due to a strongly enhanced electric field at their tips; this field is created by a thin curved space charge layer. These multiple scales are already challenging when the electrons are approximated by densities. However, electron density fluctuations in the leading edge of the front and non-thermal stretched tails of the electron energy distribution (as a cause of X-ray emissions) require a particle model to follow the electron motion. But present computers cannot deal with all electrons in a fully developed streamer. Therefore, super-particle have to be introduced, which leads to wrong statistics and numerical artifacts. The method of choice is a hybrid computation in space where individual electrons are followed in the region of high electric field and low density while the bulk of the electrons is approximated by densities (or fluids). We here develop the hybrid coupling for planar fronts. First, to obtain a consistent flux at the interface between particle and fluid model in the hybrid computation, the widely used classical fluid model is replaced by an extended fluid model. Then the coupling algorithm and the numerical implementation of the spatially hybrid model are presented in detail, in particular, the position of the model interface and the construction of the buffer region. The method carries generic features of pulled fronts that can be applied to similar problems like large deviations in the leading edge of population fronts, etc.

  18. Reconstruction of the static magnetic field of a magnetron

    Science.gov (United States)

    Krüger, Dennis; Köhn, Kevin; Gallian, Sara; Brinkmann, Ralf Peter

    2018-06-01

    The simulation of magnetron discharges requires a quantitatively correct mathematical model of the magnetic field structure. This study presents a method to construct such a model on the basis of a spatially restricted set of experimental data and a plausible a priori assumption on the magnetic field configuration. The example in focus is that of a planar circular magnetron. The experimental data are Hall probe measurements of the magnetic flux density in an accessible region above the magnetron plane [P. D. Machura et al., Plasma Sources Sci. Technol. 23, 065043 (2014)]. The a priori assumption reflects the actual design of the device, and it takes the magnetic field emerging from a center magnet of strength m C and vertical position d C and a ring magnet of strength m R , vertical position d R , and radius R. An analytical representation of the assumed field configuration can be formulated in terms of generalized hypergeometric functions. Fitting the ansatz to the experimental data with a least square method results in a fully specified analytical field model that agrees well with the data inside the accessible region and, moreover, is physically plausible in the regions outside of it. The outcome proves superior to the result of an alternative approach which starts from a multimode solution of the vacuum field problem formulated in terms of polar Bessel functions and vertical exponentials. As a first application of the obtained field model, typical electron and ion Larmor radii and the gradient and curvature drift velocities of the electron guiding center are calculated.

  19. Monte Carlo simulation of ionization in a magnetron plasma

    International Nuclear Information System (INIS)

    Miranda, J.E.; Goeckner, M.J.; Goree, J.; Sheridan, T.E.

    1990-01-01

    A Monte Carlo simulation of electrons emitted from the cathode of a planar magnetron is tested against experiments that were reported by Wendt, Lieberman, and Meuth [J. Vac. Sci. Technol. A 6, 1827 (1988)] and by Gu and Lieberman [J. Vac. Sci. Technol. A 6, 2960 (1988)]. Comparing their measurements of the radial profile of current and the axial profile of optical emission to the ionization profiles predicted by the model, we find good agreement for a typical magnetic field strength of 456 G. We also find that at 456 G the product of the average number of ionizations left-angle N i right-angle and the secondary electron emission coefficient γ is ∼1. This indicates that secondary emission contributes significantly to the ionization that sustains the discharge. At 171 G, however, left-angle N i right-angle γ much-lt 1, revealing that cathode emission is inadequate to sustain a discharge at a low magnetic field

  20. Effect of Nitrogen Content on Physical and Chemical Properties of TiN Thin Films Prepared by DC Magnetron Sputtering with Supported Discharge

    Science.gov (United States)

    Kavitha, A.; Kannan, R.; Gunasekhar, K. R.; Rajashabala, S.

    2017-10-01

    Amorphous titanium nitride (TiN) thin films have been prepared on silicon (Si) and glass substrates by direct-current (DC) reactive magnetron sputtering with a supported discharge (triode). Nitrogen gas (N2) at partial pressure of 0.3 Pa, 0.4 Pa, 0.5 Pa, and 0.6 Pa was used to prepare the TiN thin films, maintaining total pressure of argon and N2 of about 0.7 Pa. The chemical, microstructural, optical, and electrical properties of the TiN thin films were systematically studied. Presence of different phases of Ti with nitrogen (N), oxygen (O2), and carbon (C) elements was revealed by x-ray photoelectron spectroscopy characterization. Increase in the nitrogen pressure from 0.3 Pa to 0.6 Pa reduced the optical bandgap of the TiN thin film from 2.9 eV to 2.7 eV. Photoluminescence study showed that TiN thin film deposited at N2 partial pressure of 0.3 Pa exhibited three shoulder peaks at 330 nm, 335 nm, and 340 nm, which disappeared when the sample was deposited with N2 partial pressure of 0.6 Pa. Increase in the nitrogen content decreased the electrical resistivity of the TiN thin film from 3200 μΩ cm to 1800 μΩ cm. Atomic force microscopy studies of the TiN thin films deposited with N2 partial pressure of 0.6 Pa showed a uniform surface pattern associated with accumulation of fine grains. The results and advantages of this method of preparing TiN thin films are also reported.

  1. Negative Ion Sources: Magnetron and Penning

    International Nuclear Information System (INIS)

    Faircloth, D C

    2013-01-01

    The history of the magnetron and Penning electrode geometry is briefly outlined. Plasma generation by electrical discharge-driven electron impact ionization is described and the basic physics of plasma and electrodes relevant to magnetron and Penning discharges are explained. Negative ions and their applications are introduced, along with their production mechanisms. Caesium and surface production of negative ions are detailed. Technical details of how to build magnetron and Penning surface plasma sources are given, along with examples of specific sources from around the world. Failure modes are listed and lifetimes compared. (author)

  2. Negative Ion Sources: Magnetron and Penning

    CERN Document Server

    Faircloth, D.C.

    2013-12-16

    The history of the magnetron and Penning electrode geometry is briefly outlined. Plasma generation by electrical discharge-driven electron impact ionization is described and the basic physics of plasma and electrodes relevant to magnetron and Penning discharges are explained. Negative ions and their applications are introduced, along with their production mechanisms. Caesium and surface production of negative ions are detailed. Technical details of how to build magnetron and Penning surface plasma sources are given, along with examples of specific sources from around the world. Failure modes are listed and lifetimes compared.

  3. Study of the cathode region of mercury-free He-Xe low-pressure gas-discharge lamps with planar mesh electrode; Untersuchung der Kathodenregion von quecksilberfreien He-Xe Niederdruckgasentladungslampen mit planarer Geflechtelektrode

    Energy Technology Data Exchange (ETDEWEB)

    Winter, Joern

    2009-12-04

    In the present work the cathode region of a mercury-free helium-xenon low pressure discharge in spot mode was experimentally investigated. Due to the emission of electrons, the production of ions and metastable atoms as well as lifetime limiting processes the cathode region is of particular interest. To implement a discharge in spot mode a novel planar mesh electrode was developed and used as cathode. Applying the space resolved laser-atom-absorption-spectroscopy method (LAAS) the absolute particle densities of the two lowest excited xenon atoms and the gas temperature in the cathode region were determined, whereas the strong spot plasma inhomogeneity was considered. Both the excited xenon particle density and the gas temperature strongly decrease in radial and axial direction. Particularly the gas temperature has a value of about 650 K in a 1mm cathode distance and does clearly exceed room temperature. Furthermore the spectrum of the hot spot on the cathode surface was detected by means of optical emission spectroscopy. From this spectrum the temperature distribution of the cathode spot was obtained by fitting Planck's law. The temperature distribution shows a distinct maximum, which in dependence of the discharge current reaches values of 1414 K at 40 mA and 1524 K at 80 mA. From that maximum a steep direction-independent temperature decrease was obtained. A technological important aspect concerning the lifetime of a xenon based mercury-free discharge lamp is the problematic effect of the xenon gas consumption. In this work it is shown that in contrary to an industrial made standard cup electrode, which is broadly used in light advertising lamps, the gas consumption is negligible when applying the novel planar mesh electrode. This reduction of gas consumption is due to the generation of a hot spot along with high cathode temperature and low cathode fall voltage. (orig.)

  4. Study of the cathode region of mercury-free He-Xe low-pressure gas-discharge lamps with planar mesh electrode; Untersuchung der Kathodenregion von quecksilberfreien He-Xe Niederdruckgasentladungslampen mit planarer Geflechtelektrode

    Energy Technology Data Exchange (ETDEWEB)

    Winter, Joern

    2009-12-04

    In the present work the cathode region of a mercury-free helium-xenon low pressure discharge in spot mode was experimentally investigated. Due to the emission of electrons, the production of ions and metastable atoms as well as lifetime limiting processes the cathode region is of particular interest. To implement a discharge in spot mode a novel planar mesh electrode was developed and used as cathode. Applying the space resolved laser-atom-absorption-spectroscopy method (LAAS) the absolute particle densities of the two lowest excited xenon atoms and the gas temperature in the cathode region were determined, whereas the strong spot plasma inhomogeneity was considered. Both the excited xenon particle density and the gas temperature strongly decrease in radial and axial direction. Particularly the gas temperature has a value of about 650 K in a 1mm cathode distance and does clearly exceed room temperature. Furthermore the spectrum of the hot spot on the cathode surface was detected by means of optical emission spectroscopy. From this spectrum the temperature distribution of the cathode spot was obtained by fitting Planck's law. The temperature distribution shows a distinct maximum, which in dependence of the discharge current reaches values of 1414 K at 40 mA and 1524 K at 80 mA. From that maximum a steep direction-independent temperature decrease was obtained. A technological important aspect concerning the lifetime of a xenon based mercury-free discharge lamp is the problematic effect of the xenon gas consumption. In this work it is shown that in contrary to an industrial made standard cup electrode, which is broadly used in light advertising lamps, the gas consumption is negligible when applying the novel planar mesh electrode. This reduction of gas consumption is due to the generation of a hot spot along with high cathode temperature and low cathode fall voltage. (orig.)

  5. Investigation of the negative ions in Ar/O.sub.2./sub. plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry

    Czech Academy of Sciences Publication Activity Database

    Pokorný, Petr; Mišina, Martin; Bulíř, Jiří; Lančok, Ján; Fitl, Přemysl; Musil, Jindřich; Novotný, Michal

    2011-01-01

    Roč. 8, č. 5 (2011), s. 459-464 ISSN 1612-8850 R&D Projects: GA AV ČR IAA100100718; GA AV ČR KAN400100653; GA ČR GP202/09/P324 Institutional research plan: CEZ:AV0Z10100522 Keywords : energy-resolved ion mass spectrometry * formation of negative ions * magnetron sputtering * mass spectrometry * transparent conductive oxide Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 2.468, year: 2011

  6. Time-resolved tunable diode laser absorption spectroscopy of excited argon and ground-state titanium atoms in pulsed magnetron discharges

    Czech Academy of Sciences Publication Activity Database

    Sushkov, V.; Do, H.T.; Čada, Martin; Hubička, Zdeněk; Hippler, R.

    2013-01-01

    Roč. 22, č. 1 (2013), 1-10 ISSN 0963-0252 R&D Projects: GA ČR(CZ) GAP205/11/0386; GA ČR GAP108/12/2104 Institutional research plan: CEZ:AV0Z10100522 Keywords : absorption spectroscopy * diode laser * magnetron * argon metastable * HiPIMS * titanium * time-resolved Subject RIV: BH - Optics, Masers, Lasers Impact factor: 3.056, year: 2013 http://iopscience.iop.org/0963-0252/22/1/015002/

  7. Residual stress, mechanical and microstructure properties of multilayer Mo{sub 2}N/CrN coating produced by R.F Magnetron discharge

    Energy Technology Data Exchange (ETDEWEB)

    Bouaouina, B., E-mail: b.bouaouina@gmail.com [Department of physic, research unite UR-MPE, Boumerdes University 35000 (Algeria); Besnard, A. [Arts et Metiers ParisTech—LaBoMaP, 71250 Cluny (France); Abaidia, S.E. [Department of physic, research unite UR-MPE, Boumerdes University 35000 (Algeria); Haid, F. [CDTA, Plasma discharges Group, Baba hassen, Algers (Algeria)

    2017-02-15

    Highlights: • Depositing of crystallized molybdenum nitride and chromium nitride multilayer at room temperature. • Correlation between stress measurement and the shift of the XRD diffraction peak (1 1 1) of Mo{sub 2}N. • Studied the effect of the bi-layer thickness on the mechanical properties. - Abstract: We have investigated the effect of the period thickness of the multilayer Mo{sub 2}N/CrN deposited on Si substrate produced by reactive magnetron sputtering. Mo{sub 2}N presents a face centered cubic structure and CrN an orthorhombic one. The residual stress of the coatings was determined by the measurement of the substrate curvature. The microstructure of the multilayer was investigated from the X-ray diffraction and scanning electron microscopy (cross section images). The residual stresses resulting from the deposition of the different bi-layer thickness were measured and correlated to the structural properties of the coating as well as the nanoindentation analysis of the coating. The stresses are compressive and tensile for the individual Mo{sub 2}N and CrN layer respectively. The result shows that an increase of the multilayer coatings Mo{sub 2}N/CrN thicknesses induce an increase of the hardness and the elastic modulus, in the other hand the tensile stress increases. The shift of the XRD diffraction peak (1 1 1) of Mo{sub 2}N at high angle which means the reduction of the residual stress is in good agreement with the residual stresses measurements.

  8. Magnetron plasma and nanotechnology

    International Nuclear Information System (INIS)

    Kashtanov, Pavel V; Smirnov, Boris M; Hippler, Rainer

    2007-01-01

    Magnetron plasma processes involving metal atoms and clusters are reviewed. The formation of metal atoms near the cathode and their nucleation in a buffer gas flow are discussed. The flow of a buffer gas with metal clusters through a magnetron chamber disturbs the equilibrium between the buffer gas flow and clusters near the exit orifice and is accompanied by cluster attachment to the chamber walls. Cluster charging far off the cathode, the disturbance of equilibrium between the buffer gas flow and cluster drift, and the attachment of charged clusters to the chamber walls - the factors determining the output parameters of the cluster beam escaping the magnetron chamber - are analyzed. Cluster deposition on a solid surface and on dusty plasma particles is considered. (reviews of topical problems)

  9. Magnetron injection gun scaling

    International Nuclear Information System (INIS)

    Lawson, W.

    1988-01-01

    Existing analytic design equations for magnetron injection guns (MIG's) are approximated to obtain a set of scaling laws. The constraints are chosen to examine the maximum peak power capabilities of MIG's. The scaling laws are compared with exact solutions of the design equations and are supported by MIG simulations

  10. Ring magnetron ionizer

    International Nuclear Information System (INIS)

    Alessi, J.G.

    1986-01-01

    A ring magnetron D - charge exchange ionizer has been built and tested. An H - current of 500 μA was extracted with an estimated H 0 density in the ionizer of 10 12 cm -3 . This exceeds the performance of ionizers presently in use on polarized H - sources. The ionizer will soon be tested with a polarized atomic beam

  11. Spatiotemporal synchronization of drift waves in a magnetron sputtering plasma

    Czech Academy of Sciences Publication Activity Database

    Martines, E.; Zuin, M.; Cavazzana, R.; Adámek, Jiří; Antoni, V.; Serianni, G.; Spolaore, M.; Vianello, N.

    2014-01-01

    Roč. 21, č. 10 (2014), s. 102309-102309 ISSN 1070-664X Institutional support: RVO:61389021 Keywords : Drift waves * Magnetron sputtering plasma * Spatiotemporal synchronization Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 2.142, year: 2014 http://dx.doi.org/10.1063/1.4898693

  12. Multipactor discharge apparatus

    International Nuclear Information System (INIS)

    1976-01-01

    The invention deals with a multipactor discharge apparatus which can be used for tuning microwave organs such as magnetron oscillators and other cavity resonators. This apparatus is suitable for delivering an improved tuning effect in a resonation organ wherefrom the working frequency must be set. This apparatus is equipped with two multipactor discharge electrodes set in a configuration such to that a net current flows from one electrode to another. These electrodes are parallel and flat. The apparatus can be used in magnetron devices as well for continuous waves as for impulses

  13. Distribution of Fe atom density in a dc magnetron sputtering plasma source measured by laser-induced fluorescence imaging spectroscopy

    Science.gov (United States)

    Shibagaki, K.; Nafarizal, N.; Sasaki, K.; Toyoda, H.; Iwata, S.; Kato, T.; Tsunashima, S.; Sugai, H.

    2003-10-01

    Magnetron sputtering discharge is widely used as an efficient method for thin film fabrication. In order to achieve the optimized fabrication, understanding of the kinetics in plasmas is essential. In the present work, we measured the density distribution of sputtered Fe atoms using laser-induced fluorescence imaging spectroscopy. A dc magnetron plasma source with a Fe target was used. An area of 20 × 2 mm in front of the target was irradiated by a tunable laser beam having a planar shape. The picture of laser-induced fluorescence on the laser beam was taken using an ICCD camera. In this way, we obtained the two-dimensional image of the Fe atom density. As a result, it has been found that the Fe atom density observed at a distance of several centimeters from the target is higher than that adjacent to the target, when the Ar gas pressure was relatively high. It is suggested from this result that some gas-phase production processes of Fe atoms are available in the plasma. This work has been performed under the 21st Century COE Program by the Ministry of Education, Culture, Sports, Science and Technology in Japan.

  14. Substrate heating and cooling during magnetron sputtering of copper target

    Energy Technology Data Exchange (ETDEWEB)

    Shapovalov, Viktor I.; Komlev, Andrey E.; Bondarenko, Anastasia S., E-mail: stopnastia@gmail.com; Baykov, Pavel B.; Karzin, Vitaliy V.

    2016-02-22

    Heating and cooling processes of the substrate during the DC magnetron sputtering of the copper target were investigated. The sensitive element of a thermocouple was used as a substrate. It was found, that the heat outflow rate from the substrate is lower when the magnetron is turned off rather than when it is turned on. Furthermore, the heating rate, the ultimate temperature, and the heat outflow rate related to the deposition of copper atoms are directly proportional to the discharge current density. - Highlights: • New effect of heat outflow from substrate when magnetron is on was discovered. • This new effect is linear in terms of heat outflow rate to target current ratio. • Kinetic equation for heating process additively considers this effect.

  15. High-rate deposition of Ta-doped SnO2 films by reactive magnetron sputtering using a Sn–Ta metal-sintered target

    International Nuclear Information System (INIS)

    Muto, Y.; Nakatomi, S.; Oka, N.; Iwabuchi, Y.; Kotsubo, H.; Shigesato, Y.

    2012-01-01

    Ta-doped SnO 2 films were deposited on glass substrate (either unheated or heated at 200 °C) by reactive magnetron sputtering with a Sn–Ta metal-sintered target using a plasma control unit (PCU) and mid-frequency (mf, 50 kHz) unipolar pulsing. The PCU feedback system precisely controlled the flow of the reactive and sputtering gases (O 2 and Ar, respectively) by monitoring either discharge impedance or the plasma emission of the atomic O* line at 777 nm. The planar target was connected to the switching unit, which was operated in unipolar pulse mode. Power density on the target was maintained at 4.4 W cm −2 during deposition. The lowest obtained resistivity for the films deposited on heated substrate was 6.4 × 10 −3 Ωcm, where the deposition rate was 250 nm min −1 .

  16. Deposition of copper coatings in a magnetron with liquid target

    Energy Technology Data Exchange (ETDEWEB)

    Tumarkin, A. V., E-mail: sanyahrustal@mail.ru; Kaziev, A. V.; Kolodko, D. V.; Pisarev, A. A.; Kharkov, M. M.; Khodachenko, G. V. [National Research Nuclear University MEPhI (Moscow Engineering Physics Institute) (Russian Federation)

    2015-12-15

    Copper coatings were deposited on monocrystalline Si substrates using a magnetron discharge with a liquid cathode in the metal vapour plasma. During the deposition, the bias voltage in the range from 0 V to–400 V was applied to the substrate. The prepared films were investigated by a scanning electron microscope, and their adhesive properties were studied using a scratch tester. It was demonstrated that the adhesion of the deposited films strongly depends on the bias voltage and varies in a wide range.

  17. Computer simulation of sputtering of graphite target in magnetron sputtering device with two zones of erosion

    Directory of Open Access Journals (Sweden)

    Bogdanov R.V.

    2015-03-01

    Full Text Available A computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.

  18. Gas-discharge sources with charged particle emission from the plasma of glow discharge with a hollow cathode

    CERN Document Server

    Semenov, A P

    2001-01-01

    One studied properties of a magnetron discharge with a cold hollow and uncooled rod cathodes. One demonstrated the dominant effect of thermoelectron emission of a rod cathode heated in a discharge on characteristics of discharge and on emission properties of a gas-discharge plasma and the possibility pf a smooth transition of glow discharge to diffusion mode of arc discharge combustion. Paper describes sources of ions and electrons with improved physical and generalized design and engineering parameters. One shows the promise of the electrode structure of a hollow cathode magnetron discharge to be used as a source, in particular, of the atomic hydrogen and of atom flow of a working rod cathode

  19. Study of static properties of magnetron-type space charges

    International Nuclear Information System (INIS)

    Delcroix, Jean-Loup

    1953-01-01

    This research thesis reports an in-depth analysis of physical properties of static regimes to address the issue of space charges. This theoretical study of the Hull magnetron is followed by the description of experiments on the Hull magnetron which highlight transitions between the different regimes. Then, another theoretical approach aims at generalising the magnetron theory, based on other types of magnetron theory (general equations of magnetron-type space charges, inverted Hull magnetron theory, circular field magnetron theory)

  20. Angina - discharge

    Science.gov (United States)

    Chest pain - discharge; Stable angina - discharge; Chronic angina - discharge; Variant angina - discharge; Angina pectoris - discharge; Accelerating angina - discharge; New-onset angina - discharge; Angina-unstable - discharge; ...

  1. Dependence of plasma characteristics on dc magnetron sputter parameters

    International Nuclear Information System (INIS)

    Wu, S.Z.

    2005-01-01

    Plasma discharge characteristics of a dc magnetron system were measured by a single Langmuir probe at the center axis of the dual-side process chamber. Plasma potential, floating potential, electron and ion densities, and electron temperature were extracted with varying dc power and gas pressure during sputter deposition of a metal target; strong correlations were shown between these plasma parameters and the sputter parameters. The electron density was controlled mostly by secondary electron generation in constant power mode, while plasma potential reflects the confinement space variation due to change of discharge voltage. When discharge pressure was varied, plasma density increases with the increased amount of free stock molecules, while electron temperature inversely decreased, due to energy-loss collision events. In low-pressure discharges, the electron energy distribution function measurements show more distinctive bi-Maxwellian distribution, with the fast electron temperature gradually decreases with increased gas pressure

  2. Temporal evolution of electron energy distribution function and plasma parameters in the afterglow of drifting magnetron plasma

    International Nuclear Information System (INIS)

    Seo, Sang-Hun; In, Jung-Hwan; Chang, Hong-Young

    2005-01-01

    The temporal behaviour of the electron energy distribution function (EEDF) and the plasma parameters such as electron density, electron temperature and plasma and floating potentials in a mid-frequency pulsed dc magnetron plasma are investigated using time-resolved probe measurements. A negative-voltage dc pulse with an average power of 160 W during the pulse-on period, a repetition frequency of 20 kHz and a duty cycle of 50% is applied to the cathode of a planar unbalanced magnetron discharge with a grounded substrate. The measured electron energy distribution is found to exhibit a bi-Maxwellian distribution, which can be resolved with the low-energy electron group and the high-energy tail part during the pulse-on period, and a Maxwellian distribution only with low-energy electrons as a consequence of initially rapid decay of the high-energy tail part during the pulse-off period. This characteristic evolution of the EEDF is reflected in the decay characteristics of the electron density and temperature in the afterglow. These parameters exhibit twofold decay represented by two characteristic decay times of an initial fast decay time τ 1 , and a subsequent slower decay time τ 2 in the afterglow when approximated with a bi-exponential function. While the initial fast decay times are of the order of 1 μs (τ T1 ∼ 0.99 μs and τ N1 ∼ 1.5 μs), the slower decay times are of the order of a few tens of microseconds (τ T2 ∼ 7 μs and τ N2 ∼ 40 μs). The temporal evolution of the plasma parameters are qualitatively explained by considering the formation mechanism of the bi-Maxwellian electron distribution function and the electron transports of these electron groups in bulk plasma

  3. Plasma properties of RF magnetron sputtering system using Zn target

    Energy Technology Data Exchange (ETDEWEB)

    Nafarizal, N.; Andreas Albert, A. R.; Sharifah Amirah, A. S.; Salwa, O.; Riyaz Ahmad, M. A. [Microelectronic and Nanotechnology - Shamsuddin Research Centre (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia 86400 Parit Raja, Batu Pahat, Johor (Malaysia)

    2012-06-29

    In the present work, we investigate the fundamental properties of magnetron sputtering plasma using Zn target and its deposited Zn thin film. The magnetron sputtering plasma was produced using radio frequency (RF) power supply and Argon (Ar) as ambient gas. A Langmuir probe was used to collect the current from the plasma and from the current intensity, we calculate the electron density and electron temperature. The properties of Zn sputtering plasma at various discharge conditions were studied. At the RF power ranging from 20 to 100 W and gas pressure 5 mTorr, we found that the electron temperature was almost unchanged between 2-2.5 eV. On the other hand, the electron temperature increased drastically from 6 Multiplication-Sign 10{sup 9} to 1 Multiplication-Sign 10{sup 10}cm{sup -3} when the discharge gas pressure increased from 5 to 10 mTorr. The electron microscope images show that the grain size of Zn thin film increase when the discharge power is increased. This may be due to the enhancement of plasma density and sputtered Zn density.

  4. Observation of Shapiro-steps in AFM-plought micron-size YBCO planar construction

    CSIR Research Space (South Africa)

    Elkaseh, AAO

    2009-01-01

    Full Text Available Using an Atomic Force Microscope (AFM), micron size planar constriction type junctions was successfully ploughed on YBa2Cu3O7-x thin films. The 100 nanometer (nm) thin films are deposited on MgO substrates by an Inverted Cylindrical Magnetron (ICM...

  5. TOPICAL REVIEW: Physics and phenomena in pulsed magnetrons: an overview

    Science.gov (United States)

    Bradley, J. W.; Welzel, T.

    2009-05-01

    This paper reviews the contribution made to the observation and understanding of the basic physical processes occurring in an important type of magnetized low-pressure plasma discharge, the pulsed magnetron. In industry, these plasma sources are operated typically in reactive mode where a cathode is sputtered in the presence of both chemically reactive and noble gases typically with the power modulated in the mid-frequency (5-350 kHz) range. In this review, we concentrate mostly, however, on physics-based studies carried out on magnetron systems operated in argon. This simplifies the physical-chemical processes occurring and makes interpretation of the observations somewhat easier. Since their first recorded use in 1993 there have been more than 300 peer-reviewed paper publications concerned with pulsed magnetrons, dealing wholly or in part with fundamental observations and basic studies. The fundamentals of these plasmas and the relationship between the plasma parameters and thin film quality regularly have whole sessions at international conferences devoted to them; however, since many different types of magnetron geometries have been used worldwide with different operating parameters the important results are often difficult to tease out. For example, we find the detailed observations of the plasma parameter (particle density and temperature) evolution from experiment to experiment are at best difficult to compare and at worst contradictory. We review in turn five major areas of studies which are addressed in the literature and try to draw out the major results. These areas are: fast electron generation, bulk plasma heating, short and long-term plasma parameter rise and decay rates, plasma potential modulation and transient phenomena. The influence of these phenomena on the ion energy and ion energy flux at the substrate is discussed. This review, although not exhaustive, will serve as a useful guide for more in-depth investigations using the referenced

  6. Physics and phenomena in pulsed magnetrons: an overview

    International Nuclear Information System (INIS)

    Bradley, J W; Welzel, T

    2009-01-01

    This paper reviews the contribution made to the observation and understanding of the basic physical processes occurring in an important type of magnetized low-pressure plasma discharge, the pulsed magnetron. In industry, these plasma sources are operated typically in reactive mode where a cathode is sputtered in the presence of both chemically reactive and noble gases typically with the power modulated in the mid-frequency (5-350 kHz) range. In this review, we concentrate mostly, however, on physics-based studies carried out on magnetron systems operated in argon. This simplifies the physical-chemical processes occurring and makes interpretation of the observations somewhat easier. Since their first recorded use in 1993 there have been more than 300 peer-reviewed paper publications concerned with pulsed magnetrons, dealing wholly or in part with fundamental observations and basic studies. The fundamentals of these plasmas and the relationship between the plasma parameters and thin film quality regularly have whole sessions at international conferences devoted to them; however, since many different types of magnetron geometries have been used worldwide with different operating parameters the important results are often difficult to tease out. For example, we find the detailed observations of the plasma parameter (particle density and temperature) evolution from experiment to experiment are at best difficult to compare and at worst contradictory. We review in turn five major areas of studies which are addressed in the literature and try to draw out the major results. These areas are: fast electron generation, bulk plasma heating, short and long-term plasma parameter rise and decay rates, plasma potential modulation and transient phenomena. The influence of these phenomena on the ion energy and ion energy flux at the substrate is discussed. This review, although not exhaustive, will serve as a useful guide for more in-depth investigations using the referenced

  7. Hybrid plasma system for magnetron deposition of coatings with ion assistance

    International Nuclear Information System (INIS)

    Vavilin, K V; Kralkina, E A; Nekludova, P A; Petrov, A. K; Nikonov, A M; Pavlov, V B; Airapetov, A A; Odinokov, V V; Pavlov, G Ya; Sologub, V A

    2016-01-01

    The results of the study of the plasma hybrid system based on the combined magnetron discharge and high-frequency inductive discharge located in the external magnetic field is presented. Magnetron discharge provides the generation of atoms and ions of the target materials while the flow of accelerated ions used for the ion assistance is provided by the RF inductive discharge. An external magnetic field is used to optimize the power input to the discharge, to increase the ion current density in the realm of substrate and to enhance the area of uniform plasma. The joint operation of magnetron and RF inductive discharge leads to a substantial increase (not equal to the sum of the parameters obtained under separate operation of two hybrid system channels) of the ion current density and intensity of sputtered material spectral lines radiation. Optimal mode of the hybrid plasma system operation provides uniform ion current density on the diameter of at least 150mm at 0.7PA argon pressure. The optimal values of the magnetic fields in the region of the substrate location lie in the range 2-8 mTl, while in the region of the RF input power unit lie in the range 0.5-25 mTl. (paper)

  8. Solid-state pulse modulator for a 1.7-MW X-band magnetron

    International Nuclear Information System (INIS)

    Choi, Jaegu; Shin, Yongmoon; Choi, Youngwook; Kim, Kwanho

    2014-01-01

    Medical linear accelerators (LINAC) for cancer treatment require pulse modulators to generate high-power pulses with a fast rise time, flat top and short duration to drive high-power magnetrons. Solid-state pulse modulators (SSPM) for medical LINACs that use high power semiconductor switches with high repetition rates, high stability and long lifetimes have been introduced to replace conventional linear-type pulse generators that use gaseous discharge switches. In this paper, the performance of a developed SSPM, which mainly consists of a capacitor charger, an insulated-gate bipolar transistor (IGBT) - capacitor stack and a pulse transformer, is evaluated with a dummy load and an X-band magnetron load. A theoretical analysis of the pulse transformer, which is a critical element of the SSPM, is carried out. The output pulse has a fast rise time and low droop, such that the modulator can drive the X-band magnetron.

  9. The Pulsed Cylindrical Magnetron for Deposition

    Science.gov (United States)

    Korenev, Sergey

    2012-10-01

    The magnetron sputtering deposition of films and coatings broadly uses in microelectronics, material science, environmental applications and etc. The rate of target evaporation and time for deposition of films and coatings depends on magnetic field. These parameters link with efficiency of gas molecules ionization by electrons. The cylindrical magnetrons use for deposition of films and coatings on inside of pipes for different protective films and coatings in oil, chemical, environmental applications. The classical forming of magnetic field by permanent magnets or coils for big and long cylindrical magnetrons is complicated. The new concept of pulsed cylindrical magnetron for high rate deposition of films and coating for big and long pipes is presented in this paper. The proposed cylindrical magnetron has azimuthally pulsed high magnetic field, which allows forming the high ionized plasma and receiving high rate of evaporation material of target (central electrode). The structure of proposed pulsed cylindrical magnetron sputtering system is given. The main requirements to deposition system are presented. The preliminary data for forming of plasma and deposition of Ta films and coatings on the metal pipers are discussed. The comparison of classical and proposed cylindrical magnetrons is given. The analysis of potential applications is considered.

  10. A Plasma Lens for Magnetron Sputtering

    International Nuclear Information System (INIS)

    Anders, Andre; Brown, Jeff

    2010-01-01

    A plasma lens, consisting of a solenoid and potential-defining ring electrodes, has been placed between a magnetron and substrates to be coated. Photography reveals qualitative information on excitation, ionization, and the transport of plasma to the substrate.

  11. Understanding of hybrid PVD–PECVD process with the aim of growing hard nc-TiC/a-C:H coatings using industrial devices with a rotating cylindrical magnetron

    Czech Academy of Sciences Publication Activity Database

    Žemlička, R.; Jílek, M.; Vogl, P.; Souček, P.; Buršíková, V.; Buršík, Jiří; Vašina, P.

    2014-01-01

    Roč. 255, 25 September (2014), s. 118-123 ISSN 0257-8972 Institutional support: RVO:68081723 Keywords : nanocomposite * magnetron sputtering * process control Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 1.998, year: 2014

  12. Composite SiOx/hydrocarbon plasma polymer films prepared by RF magnetron sputtering of SiO2 and polyimide

    Czech Academy of Sciences Publication Activity Database

    Drabik, M.; Kousal, J.; Pinosh, Y.; Choukourov, A.; Biederman, H.; Slavínská, D.; Macková, Anna; Boldyryeva, Hanna; Pešička, J.

    2007-01-01

    Roč. 81, č. 7 (2007), s. 920-927 ISSN 0042-207X Institutional research plan: CEZ:AV0Z10480505 Keywords : composite films * magnetron * sputtering * polyimide * SiO2 Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 0.881, year: 2007

  13. Depth profile analyses of nc-TiC/a-C:H coating prepared by balanced magnetron sputtering

    Czech Academy of Sciences Publication Activity Database

    Vašina, P.; Souček, P.; Schmidtová, T.; Eliáš, M.; Buršíková, V.; Jílek, M.; Jílek Jr., M.; Schäfer, C.; Buršík, Jiří

    2011-01-01

    Roč. 205, Suppl. 2 (2011), S53-S56 ISSN 0257-8972 Institutional research plan: CEZ:AV0Z20410507 Keywords : composite * mechanical properties * magnetron Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 1.867, year: 2011

  14. Recent operation of the FNAL magnetron H- ion source

    Science.gov (United States)

    Karns, P. R.; Bollinger, D. S.; Sosa, A.

    2017-08-01

    This paper will detail changes in the operational paradigm of the Fermi National Accelerator Laboratory (FNAL) magnetron H- ion source due to upgrades in the accelerator system. Prior to November of 2012 the H- ions for High Energy Physics (HEP) experiments were extracted at ˜18 keV vertically downward into a 90 degree bending magnet and accelerated through a Cockcroft-Walton accelerating column to 750 keV. Following the upgrade in the fall of 2012 the H- ions are now directly extracted from a magnetron at 35 keV and accelerated to 750 keV by a Radio Frequency Quadrupole (RFQ). This change in extraction energy as well as the orientation of the ion source required not only a redesign of the ion source, but an updated understanding of its operation at these new values. Discussed in detail are the changes to the ion source timing, arc discharge current, hydrogen gas pressure, and cesium delivery system that were needed to maintain consistent operation at >99% uptime for HEP, with an increased ion source lifetime of over 9 months.

  15. Spokes and charged particle transport in HiPIMS magnetrons

    International Nuclear Information System (INIS)

    Brenning, N; Lundin, D; Minea, T; Vitelaru, C; Costin, C

    2013-01-01

    Two separate scientific communities are shown to have studied one common phenomenon, azimuthally rotating dense plasma structures, also called spokes, in pulsed-power E × B discharges, starting from quite different approaches. The first body of work is motivated by fundamental plasma science and concerns a phenomenon called the critical ionization velocity, CIV, while the other body of work is motivated by the applied plasma science of high power impulse magnetron sputtering (HiPIMS). Here we make use of this situation by applying experimental observations, and theoretical analysis, from the CIV literature to HiPIMS discharges. For a practical example, we take data from observed spokes in HiPIMS discharges and focus on their role in charged particle transport, and in electron energization. We also touch upon the closely related questions of how they channel the cross-B discharge current, how they maintain their internal potential structure and how they influence the energy spectrum of the ions? New particle-in-cell Monte Carlo collisional simulations that shed light on the azimuthal drift and expansion of the spokes are also presented. (paper)

  16. Particle-balance models for pulsed sputtering magnetrons

    Science.gov (United States)

    Huo, Chunqing; Lundin, D.; Gudmundsson, J. T.; Raadu, M. A.; Bradley, J. W.; Brenning, N.

    2017-09-01

    The time-dependent plasma discharge ionization region model (IRM) has been under continuous development during the past decade and used in several studies of the ionization region of high-power impulse magnetron sputtering (HiPIMS) discharges. In the present work, a complete description of the most recent version of the IRM is given, which includes improvements, such as allowing for returning of the working gas atoms from the target, a separate treatment of hot secondary electrons, addition of doubly charged metal ions, etc. To show the general applicability of the IRM, two different HiPIMS discharges are investigated. The first set concerns 400 μs long discharge pulses applied to an Al target in an Ar atmosphere at 1.8 Pa. The second set focuses on 100 μs long discharge pulses applied to a Ti target in an Ar atmosphere at 0.54 Pa, and explores the effects of varying the magnetic field strength. The model results show that Al2+ -ions contribute negligibly to the production of secondary electrons, while Ti2+ -ions effectively contribute to the production of secondary electrons. Similarly, the model results show that for an argon discharge with Al target the contribution of Al+-ions to the discharge current at the target surface is over 90% at 800 V. However, at 400 V the Al+-ions and Ar+-ions contribute roughly equally to the discharge current in the initial peak, while in the plateau region Ar+-ions contribute to roughly \\frac{2}{3} of the current. For high currents the discharge with Al target develops almost pure self-sputter recycling, while the discharge with Ti target exhibits close to a 50/50 combination of self-sputter recycling and working gas-recycling. For a Ti target, a self-sputter yield significantly below unity makes working gas-recycling necessary at high currents. For the discharge with Ti target, a decrease in the B-field strength, resulted in a corresponding stepwise increase in the discharge resistivity.

  17. Study of static properties of magnetron-type space charges; Etude des proprietes statiques des charges d'espace du type magnetron

    Energy Technology Data Exchange (ETDEWEB)

    Delcroix, Jean-Loup

    1953-05-30

    This research thesis reports an in-depth analysis of physical properties of static regimes to address the issue of space charges. This theoretical study of the Hull magnetron is followed by the description of experiments on the Hull magnetron which highlight transitions between the different regimes. Then, another theoretical approach aims at generalising the magnetron theory, based on other types of magnetron theory (general equations of magnetron-type space charges, inverted Hull magnetron theory, circular field magnetron theory)

  18. Multi-sided metallization of textile fibres by using magnetron system with grounded cathode

    Directory of Open Access Journals (Sweden)

    Chodun Rafał

    2017-10-01

    Full Text Available The synthesis of coatings on textiles fibers enables functionalization of their properties e.g.: changing the reaction on IR radiation. In our experiment, a magnetron with a grounded cathode and positively biased anode was used as a source of plasma. A ring anode was positioned at 8 cm distance from the cathode. Samples of glass and cotton textile were placed at the plane of the anode. Ti and TiN coatings were deposited by sputtering of titanium target in Ar or Ar+ N2 atmosphere. SEM studies showed that, using the magnetron system described above, the textile fibers were covered by the 2 μm to 3 μm thick coatings. Unexpectedly, the coatings were deposited at both sides of the samples: the front side was exposed to glow discharge plasma and the backside was completely shaded from the plasma. IR optical investigation exhibited significant change in reflectance and transmittance of the coated textiles. The using of standard magnetron system (grounded anode and cathode at negative potential resulted in a coating deposition at the textile side exposed to the plasma action only. We believe that the multi-sided deposition of coatings observed during the process run with magnetron with grounded cathode is a result of an ambipolar diffusion mechanism in the anodic potential drop region.

  19. CEERI-CAT joint venture for development of accelerator magnetrons

    International Nuclear Information System (INIS)

    Prasad, Sharda; Kaushik, S.C.; Mahesh Kumar; Chaudhary, P.; Shrivastava, Purushottam; Wanmode, Y.; Hannurkar, P.R.

    2003-01-01

    LINAC and Microtron systems for electron acceleration up to few tens of MeV, requires pulsed RF sources such as magnetron and klystron in S-Band frequency range with peak power in the range of few MW. The major emphasis under this program was to develop critical technologies involved in the development of 2 MW magnetron. This paper discusses the development of 2 MW magnetron along with critical technologies involved and test facilities developed by CAT for testing of this magnetron

  20. Analysis of peer-to-peer locking of magnetrons

    International Nuclear Information System (INIS)

    Pengvanich, P.; Lau, Y. Y.; Cruz, E.; Gilgenbach, R. M.; Hoff, B.; Luginsland, J. W.

    2008-01-01

    The condition for mutual, or peer-to-peer, locking of two magnetrons is derived. This condition reduces to Adler's classical phase-locking condition in the limit where one magnetron becomes the ''master'' and the other becomes the ''slave.'' The formulation is extended to the peer-to-peer locking of N magnetrons, under the assumption that the electromagnetic coupling among the N magnetrons is modeled by an N-port network.

  1. RF magnetron sputtering of polypropylene

    Czech Academy of Sciences Publication Activity Database

    Stelmashuk, Vitaliy; Biederman, H.; Slavinská, D.; Trchová, Miroslava; Hlídek, P.

    2004-01-01

    Roč. 75, č. 3 (2004), s. 207-215 ISSN 0042-207X R&D Projects: GA MŠk ME 553; GA MŠk ME 554 Institutional research plan: CEZ:AV0Z2043910 Keywords : materials science, multidisciplinary, physics, applied Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 0.902, year: 2004

  2. Study of deposition rae coating of Ag thin films by magnetron sputtering

    International Nuclear Information System (INIS)

    Ghanati, M.; Zendehnam, A.

    2003-01-01

    Exact knowledge about deposition rate and its distribution and variation of them with respect to coating parameters (Gas pressure, Distance, discharge current,..) is very vital. In this experimental research coating of Ag thin films by magnetron sputtering have been carried out over Ar pressure range of 10 -2 -10 -1 mbar, and discharge current up to 1000 m.A, and distance between glass substrates to silver target (Cathode) was changed from 5 to 15 cm. The obtained results have been investigated by help of computer curve fitting, and these studies show a very good agreement for the conditions used in this work

  3. The Development and Application of the Magnetron,

    Science.gov (United States)

    1982-03-31

    of *medicine. The power of the magnetron used is from several tens of watts to several hundred watts. Microwave physiotherapy has been used in...clinical practice for the fast cure of arthritis , rheumatism and the subsidence of swelling. Therapeutic results have been excellent. In recent years

  4. Pancreatitis - discharge

    Science.gov (United States)

    Chronic pancreatitis - discharge; Pancreatitis - chronic - discharge; Pancreatic insufficiency - discharge; Acute pancreatitis - discharge ... You were in the hospital because you have pancreatitis. This is a swelling of the pancreas. You ...

  5. Heart pacemaker - discharge

    Science.gov (United States)

    Cardiac pacemaker implantation - discharge; Artificial pacemaker - discharge; Permanent pacemaker - discharge; Internal pacemaker - discharge; Cardiac resynchronization therapy - discharge; CRT - discharge; ...

  6. Beyond level planarity

    NARCIS (Netherlands)

    Angelini, P.; Da Lozzo, G.; Di Battista, G.; Frati, F.; Patrignani, M.; Rutter, I.; Hu, Y.; Nöllenburg, M.

    2016-01-01

    In this paper we settle the computational complexity of two open problems related to the extension of the notion of level planarity to surfaces different from the plane. Namely, we show that the problems of testing the existence of a level embedding of a level graph on the surface of the rolling

  7. HP Ge planar detectors

    International Nuclear Information System (INIS)

    Gornov, M.G.; Gurov, Yu.B.; Soldatov, A.M.; Osipenko, B.P.; Yurkowski, J.; Podkopaev, O.I.

    1989-01-01

    Parameters of planar detectors manufactured of HP Ge are presented. The possibilities to use multilayer spectrometers on the base of such semiconductor detectors for nuclear physics experiments are discussed. It is shown that the obtained detectors including high square ones have spectrometrical characteristics close to limiting possible values. 9 refs.; 3 figs.; 1 tab

  8. Electron relaxation properties of Ar magnetron plasmas

    Science.gov (United States)

    Xinjing, CAI; Xinxin, WANG; Xiaobing, ZOU

    2018-03-01

    An understanding of electron relaxation properties in plasmas is of importance in the application of magnetrons. An improved multi-term approximation of the Boltzmann equation is employed to study electron transport and relaxation properties in plasmas. Elastic, inelastic and nonconservative collisions between electrons and neutral particles are considered. The expressions for the transport coefficients are obtained using the expansion coefficients and the collision operator term. Numerical solutions of the matrix equations for the expansion coefficients are also investigated. Benchmark calculations of the Reid model are presented to demonstrate the accuracy of the improved multi-term approximation. It is shown that the two-term approximation is generally not accurate enough and the magnetic fields can reduce the anisotropy of the velocity distribution function. The electron relaxation properties of Ar plasmas in magnetrons for various magnetic fields are studied. It is demonstrated that the energy parameters change more slowly than the momentum parameters.

  9. Fuzzy tungsten in a magnetron sputtering device

    Energy Technology Data Exchange (ETDEWEB)

    Petty, T.J., E-mail: tjpetty@liv.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ (United Kingdom); Khan, A. [Pariser Building-G11, School of Mechanical, Aerospace and Civil Engineering, The University of Manchester, Manchester, M13 9PL (United Kingdom); Heil, T. [NiCaL, Block C Waterhouse Building, 1-3 Brownlow Street, Liverpool, L69 3GL (United Kingdom); Bradley, J.W., E-mail: j.w.bradley@liverpool.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ (United Kingdom)

    2016-11-15

    Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 10{sup 23}–3.0 × 10{sup 24} m{sup −2}, the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 10{sup 24} m{sup −2}, and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ{sup 1/2} relation as opposed to the incubation fluence fit. - Highlights: • Fuzz has been created in a magnetron sputtering device. • Three parameters for fuzz formation have been swept. • A cross-over from pre-fuzz to fully formed fuzz is seen. • Evidence for annealing out at lower temperatures than has been seen before. • Evidence to suggest that fuzz grown in discrete exposures is not consistent with fuzz grown in one long exposure.

  10. Fuzzy tungsten in a magnetron sputtering device

    International Nuclear Information System (INIS)

    Petty, T.J.; Khan, A.; Heil, T.; Bradley, J.W.

    2016-01-01

    Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 10 23 –3.0 × 10 24  m −2 , the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 10 24  m −2 , and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ 1/2 relation as opposed to the incubation fluence fit. - Highlights: • Fuzz has been created in a magnetron sputtering device. • Three parameters for fuzz formation have been swept. • A cross-over from pre-fuzz to fully formed fuzz is seen. • Evidence for annealing out at lower temperatures than has been seen before. • Evidence to suggest that fuzz grown in discrete exposures is not consistent with fuzz grown in one long exposure.

  11. Evaluation of composition, mechanical properties and structure of nc-TiC/a-C:H coatings prepared by balanced magnetron sputtering

    Czech Academy of Sciences Publication Activity Database

    Souček, P.; Schmidtová, T.; Zábranský, L.; Buršíková, V.; Vašina, P.; Caha, O.; Jílek, M.; Abdelazziz, El Mel.; Tessier, P.Y.; Schäfer, J.; Buršík, Jiří; Peřina, Vratislav; Mikšová, Romana

    2012-01-01

    Roč. 211, OCT 25 (2012), s. 111-116 ISSN 0257-8972 Institutional support: RVO:68081723 ; RVO:61389005 Keywords : nanocomposite * magnetron sputtering * titanium Subject RIV: JI - Composite Materials; BL - Plasma and Gas Discharge Physics (UJF-V) Impact factor: 1.941, year: 2012

  12. How to draw a planarization

    NARCIS (Netherlands)

    Bläsius, T.; Radermacher, M.; Rutter, I.; Steffen, B.; Baier, C.; van den Brand, M.; Eder, J.; Hinchey, M.; Margaria, T.

    2017-01-01

    We study the problem of computing straight-line drawings of non-planar graphs with few crossings. We assume that a crossing-minimization algorithm is applied first, yielding a planarization, i.e., a planar graph with a dummy vertex for each crossing, that fixes the topology of the resulting drawing.

  13. Bimodular high temperature planar oxygen gas sensor

    Directory of Open Access Journals (Sweden)

    Xiangcheng eSun

    2014-08-01

    Full Text Available A bimodular planar O2 sensor was fabricated using NiO nanoparticles (NPs thin film coated yttria-stabilized zirconia (YSZ substrate. The thin film was prepared by radio frequency (r.f. magnetron sputtering of NiO on YSZ substrate, followed by high temperature sintering. The surface morphology of NiO nanoparticles film was characterized by atomic force microscopy (AFM and scanning electron microscopy (SEM. X-ray diffraction (XRD patterns of NiO NPs thin film before and after high temperature O2 sensing demonstrated that the sensing material possesses a good chemical and structure stability. The oxygen detection experiments were performed at 500 °C, 600 °C and 800 °C using the as-prepared bimodular O2 sensor under both potentiometric and resistance modules. For the potentiometric module, a linear relationship between electromotive force (EMF output of the sensor and the logarithm of O2 concentration was observed at each operating temperature, following the Nernst law. For the resistance module, the logarithm of electrical conductivity was proportional to the logarithm of oxygen concentration at each operating temperature, in good agreement with literature report. In addition, this bimodular sensor shows sensitive, reproducible and reversible response to oxygen under both sensing modules. Integration of two sensing modules into one sensor could greatly enrich the information output and would open a new venue in the development of high temperature gas sensors.

  14. A PLL based automated magnetron tuning mechanism for electron accelerators

    International Nuclear Information System (INIS)

    Khan, A M; Mahfooz, Mohammed; Sanjeev, Ganesh

    2008-01-01

    In this paper we report on a control system developed to tune the magnetron frequency to get the maximum beam pulse in a Microtron (an electron accelerator facility at Mangalore University). The control system so designed consists of a Microcontroller Unit (MCU), a Phase Locked Loop (PLL) and a Digital to Analog Converter (DAC) to track and tune the magnetron frequency. A PLL is used to track the deviation of the magnetron output frequency, and by monitoring the reflected wave voltage level, the microcontroller unit tunes the magnetron with the help of a tuner mechanism connected through a stepper motor.

  15. A PLL based automated magnetron tuning mechanism for electron accelerators

    Energy Technology Data Exchange (ETDEWEB)

    Khan, A M; Mahfooz, Mohammed [Dept. of Electronics, Mangalore University, Mangalagangotri, Karnataka State, India - 574 199 (India); Sanjeev, Ganesh [Microtron Centre, Mangalore University, Mangalagangotri, Karnataka State, India - 574 199 (India)], E-mail: mahfooz_81@yahoo.com

    2008-09-15

    In this paper we report on a control system developed to tune the magnetron frequency to get the maximum beam pulse in a Microtron (an electron accelerator facility at Mangalore University). The control system so designed consists of a Microcontroller Unit (MCU), a Phase Locked Loop (PLL) and a Digital to Analog Converter (DAC) to track and tune the magnetron frequency. A PLL is used to track the deviation of the magnetron output frequency, and by monitoring the reflected wave voltage level, the microcontroller unit tunes the magnetron with the help of a tuner mechanism connected through a stepper motor.

  16. Estimation of Sputtering Damages on a Magnetron H- Ion Source Induced by Cs+ and H+ Ions

    CERN Document Server

    Pereira, H; Alessi, J; Kalvas, t

    2013-01-01

    An H− ion source is being developed for CERN’s Linac4 accelerator. A beam current requirement of 80 mA and a reliability above 99% during 1 year with 3 month uninterrupted operation periods are mandatory. To design a low-maintenance long life-time source, it is important to investigate and understand the wear mechanisms. A cesiated plasma discharge ion source, such as the BNL magnetron source, is a good candidate for the Linac4 ion source. However, in the magnetron source operated at BNL, the removal of material from the molybdenum cathode and the stainless steel anode cover plate surfaces is visible after extended operation periods. The observed sputtering traces are shown to result from cesium vapors and hydrogen gas ionized in the extraction region and subsequently accelerated by the extraction field. This paper presents a quantitative estimate of the ionization of cesium and hydrogen by the electron and H− beams in the extraction region of BNL’s magnetron ion source. The respective contributions o...

  17. Plasma ``anti-assistance'' and ``self-assistance'' to high power impulse magnetron sputtering

    Science.gov (United States)

    Anders, André; Yushkov, Georgy Yu.

    2009-04-01

    A plasma assistance system was investigated with the goal to operate high power impulse magnetron sputtering (HiPIMS) at lower pressure than usual, thereby to enhance the utilization of the ballistic atoms and ions with high kinetic energy in the film growth process. Gas plasma flow from a constricted plasma source was aimed at the magnetron target. Contrary to initial expectations, such plasma assistance turned out to be contraproductive because it led to the extinction of the magnetron discharge. The effect can be explained by gas rarefaction. A better method of reducing the necessary gas pressure is operation at relatively high pulse repetition rates where the afterglow plasma of one pulse assists in the development of the next pulse. Here we show that this method, known from medium-frequency (MF) pulsed sputtering, is also very important at the much lower pulse repetition rates of HiPIMS. A minimum in the possible operational pressure is found in the frequency region between HiPIMS and MF pulsed sputtering.

  18. Plasma 'anti-assistance' and 'self-assistance' to high power impulse magnetron sputtering

    International Nuclear Information System (INIS)

    Anders, Andre; Yushkov, Georgy Yu.

    2009-01-01

    A plasma assistance system was investigated with the goal to operate high power impulse magnetron sputtering (HiPIMS) at lower pressure than usual, thereby to enhance the utilization of the ballistic atoms and ions with high kinetic energy in the film growth process. Gas plasma flow from a constricted plasma source was aimed at the magnetron target. Contrary to initial expectations, such plasma assistance turned out to be contraproductive because it led to the extinction of the magnetron discharge. The effect can be explained by gas rarefaction. A better method of reducing the necessary gas pressure is operation at relatively high pulse repetition rates where the afterglow plasma of one pulse assists in the development of the next pulse. Here we show that this method, known from medium-frequency (MF) pulsed sputtering, is also very important at the much lower pulse repetition rates of HiPIMS. A minimum in the possible operational pressure is found in the frequency region between HiPIMS and MF pulsed sputtering

  19. Implementation of Design Changes Towards a More Reliable, Hands-off Magnetron Ion Source

    Energy Technology Data Exchange (ETDEWEB)

    Sosa, A. [Fermilab; Bollinger, D. S. [Fermilab; Karns, P. R. [Fermilab; Tan, C. Y. [Fermilab

    2017-12-07

    As the main H- ion source for the accelerator complex, magnetron ion sources have been used at Fermilab since the 1970’s. At the offline test stand, new R&D is carried out to develop and upgrade the present magnetron-type sources of H- ions of up to 80 mA and 35 keV beam energy in the context of the Proton Improvement Plan. The aim of this plan is to provide high-power proton beams for the experiments at FNAL. In order to reduce the amount of tuning and monitoring of these ion sources, a new electronic system consisting of a current-regulated arc discharge modulator allow the ion source to run at a constant arc current for improved beam output and operation. A solenoid-type gas valve feeds H2 gas into the source precisely and independently of ambient temperature. This summary will cover several studies and design changes that have been tested and will eventually be implemented on the operational magnetron sources at Fermilab. Innovative results for this type of ion source include cathode geometries, solenoid gas valves, current controlled arc pulser, cesium boiler redesign, gas mixtures of hydrogen and nitrogen, and duty factor reduction, with the aim to improve source lifetime, stability, and reducing the amount of tuning needed. In this summary, I will highlight the advances made in ion sources at Fermilab and will outline the directions of the continuing R&D effort.

  20. Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering

    Czech Academy of Sciences Publication Activity Database

    Straňák, V.; Hubička, Zdeněk; Čada, Martin; Bogdanowicz, R.; Wulff, H.; Helm, C.A.; Hippler, R.

    2018-01-01

    Roč. 51, č. 9 (2018), s. 1-12, č. článku 095205. ISSN 0022-3727 R&D Projects: GA ČR GA17-08389S Institutional support: RVO:68378271 Keywords : high power impulse magnetron sputtering (HiPIMS) * iron oxide thin films * wüstite * magnetite * maghemite * hematite Subject RIV: BL - Plasma and Gas Discharge Physics OBOR OECD: Fluids and plasma physics (including surface physics ) Impact factor: 2.588, year: 2016

  1. Planar metasurface retroreflector

    Science.gov (United States)

    Arbabi, Amir; Arbabi, Ehsan; Horie, Yu; Kamali, Seyedeh Mahsa; Faraon, Andrei

    2017-07-01

    Metasurfaces are two-dimensional arrangements of subwavelength scatterers that control the propagation of optical waves. Here, we show that cascaded metasurfaces, each performing a predefined mathematical transformation, provide a new optical design framework that enables new functionalities not yet demonstrated with single metasurfaces. Specifically, we demonstrate that retroreflection can be achieved with two vertically stacked planar metasurfaces, the first performing a spatial Fourier transform and its inverse, and the second imparting a spatially varying momentum to the Fourier transform of the incident light. Using this concept, we fabricate and test a planar monolithic near-infrared retroreflector composed of two layers of silicon nanoposts, which reflects light along its incident direction with a normal incidence efficiency of 78% and a large half-power field of view of 60°. The metasurface retroreflector demonstrates the potential of cascaded metasurfaces for implementing novel high-performance components, and enables low-power and low-weight passive optical transmitters.

  2. Routed planar networks

    Directory of Open Access Journals (Sweden)

    David J. Aldous

    2016-04-01

    Full Text Available Modeling a road network as a planar graph seems very natural. However, in studying continuum limits of such networks it is useful to take {\\em routes} rather than {\\em edges} as primitives. This article is intended to introduce the relevant (discrete setting notion of {\\em routed network} to graph theorists. We give a naive classification of all 71 topologically different such networks on 4 leaves, and pose a variety of challenging research questions.

  3. Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber

    Czech Academy of Sciences Publication Activity Database

    Pokorný, Petr; Musil, Jindřich; Fitl, Přemysl; Novotný, Michal; Lančok, Ján; Bulíř, Jiří

    2015-01-01

    Roč. 12, č. 5 (2015), s. 416-421 ISSN 1612-8850 R&D Projects: GA ČR(CZ) GAP108/11/1298; GA ČR(CZ) GAP108/11/1312; GA ČR(CZ) GAP108/11/0958; GA ČR(CZ) GA14-10279S Institutional support: RVO:68378271 Keywords : contamination * low-pressure discharges * magnetron * metallic films * sputtering Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 2.713, year: 2015

  4. FAST TRACK COMMUNICATION: Deposition of amino-rich thin films by RF magnetron sputtering of nylon

    Science.gov (United States)

    Kylián, O.; Hanuš, J.; Choukourov, A.; Kousal, J.; Slavínská, D.; Biederman, H.

    2009-07-01

    RF magnetron sputtering of a nylon target in different gas mixtures was studied in order to evaluate the capability of this process to deposit amino-rich coatings needed in a wide range of biomedical applications. It has been demonstrated that both the deposition rate of the coatings and the surface density of primary amino groups are strongly linked with working gas mixture composition. From this point of view, a sufficiently high deposition rate as well as the highest amine efficiency reaching a NH2/C value of 18% was observed in the N2/H2 discharge, which leads to the surface exhibiting a high rate of protein adsorption.

  5. Nipple Discharge

    Science.gov (United States)

    ... any unexpected nipple discharge evaluated by a doctor. Nipple discharge in men under any circumstances could be a problem and needs further evaluation. One or both breasts may produce a nipple discharge, either spontaneously or when you squeeze your ...

  6. A hybrid electron cyclotron resonance metal ion source with integrated sputter magnetron for the production of an intense Al{sup +} ion beam

    Energy Technology Data Exchange (ETDEWEB)

    Weichsel, T., E-mail: tim.weichsel@fep.fraunhofer.de; Hartung, U.; Kopte, T. [Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, 01277 Dresden (Germany); Zschornack, G. [Institute of Solid State Physics, Dresden University of Technology, 01062 Dresden, Germany and Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Dresden (Germany); Kreller, M.; Philipp, A. [DREEBIT GmbH, 01900 Grossroehrsdorf (Germany)

    2015-09-15

    A metal ion source prototype has been developed: a combination of magnetron sputter technology with 2.45 GHz electron cyclotron resonance (ECR) ion source technology—a so called magnetron ECR ion source (MECRIS). An integrated ring-shaped sputter magnetron with an Al target is acting as a powerful metal atom supply in order to produce an intense current of singly charged metal ions. Preliminary experiments show that an Al{sup +} ion current with a density of 167 μA/cm{sup 2} is extracted from the source at an acceleration voltage of 27 kV. Spatially resolved double Langmuir probe measurements and optical emission spectroscopy were used to study the plasma states of the ion source: sputter magnetron, ECR, and MECRIS plasma. Electron density and temperature as well as Al atom density were determined as a function of microwave and sputter magnetron power. The effect of ECR heating is strongly pronounced in the center of the source. There the electron density is increased by one order of magnitude from 6 × 10{sup 9} cm{sup −3} to 6 × 10{sup 10} cm{sup −3} and the electron temperature is enhanced from about 5 eV to 12 eV, when the ECR plasma is ignited to the magnetron plasma. Operating the magnetron at constant power, it was observed that its discharge current is raised from 1.8 A to 4.8 A, when the ECR discharge was superimposed with a microwave power of 2 kW. At the same time, the discharge voltage decreased from about 560 V to 210 V, clearly indicating a higher plasma density of the MECRIS mode. The optical emission spectrum of the MECRIS plasma is dominated by lines of excited Al atoms and shows a significant contribution of lines arising from singly ionized Al. Plasma emission photography with a CCD camera was used to prove probe measurements and to identify separated plasma emission zones originating from the ECR and magnetron discharge.

  7. UV-Enhanced Ethanol Sensing Properties of RF Magnetron-Sputtered ZnO Film.

    Science.gov (United States)

    Huang, Jinyu; Du, Yu; Wang, Quan; Zhang, Hao; Geng, Youfu; Li, Xuejin; Tian, Xiaoqing

    2017-12-26

    ZnO film was deposited by the magnetron sputtering method. The thickness of ZnO film is approximately 2 μm. The influence of UV light illumination on C₂H₅OH sensing properties of ZnO film was investigated. Gas sensing results revealed that the UV-illuminated ZnO film displays excellent C₂H₅OH characteristics in terms of high sensitivity, excellent selectivity, rapid response/recovery, and low detection limit down to 0.1 ppm. The excellent sensing performance of the sensor with UV activation could be attributed to the photocatalytic oxidation of ethanol on the surface of the ZnO film, the planar film structure with high utilizing efficiency of UV light, high electron mobility, and a good surface/volume ratio of of ZnO film with a relatively rough and porous surface.

  8. DEVICE FOR INVESTIGATION OF MAGNETRON AND PULSED-LASER PLASMA

    Directory of Open Access Journals (Sweden)

    A. P. Burmakov

    2012-01-01

    Full Text Available Various modifications of complex pulsed laser and magnetron deposition thin-film structures unit are presented. They include joint and separate variants of layer deposition. Unit realizes the plasma parameters control and enhances the possibility of laser-plasma and magnetron methods of coatings deposition.

  9. High power pulsed magnetron sputtering of transparent conducting oxides

    International Nuclear Information System (INIS)

    Sittinger, V.; Ruske, F.; Werner, W.; Jacobs, C.; Szyszka, B.; Christie, D.J.

    2008-01-01

    High power pulsed magnetron sputtering (HPPMS) has been used in order to study the deposition of transparent conducting oxides. We summarize the studies carried out on different materials (indium tin oxide-ITO and aluminium-doped zinc oxide-AZO) using rather different technological approaches, namely sputtering of ceramic targets and reactive sputtering. For the deposition of AZO reactive HPPMS for metallic targets has been used. A feedback control loop has been implemented in order to stabilize the discharge at any given setpoint on the hysteresis curve. The hysteresis was also found to have a rather untypical form. Reactive HPPMS was found to be a promising tool for obtaining high quality films of low total thickness. In the case of ITO deposition a ceramic target has been used. The process has been characterized in terms of its plasma emission and increasing indium ionization was found for higher peak power densities. The properties of the deposited films were compared to DC sputtered films. While for DC sputtering the choice of oxygen addition and shieldings is crucial for determining surface morphology and resistivity, in HPPMS sputtering peak power density has been found to be a good parameter for influencing the crystal structure. The morphologies obtained differ strongly from those seen in DC sputtering. At high power densities films with low surface roughness and excellent resistivity could be deposited without the use of shieldings

  10. A microcontroller based tuning mechanism for the magnetron

    International Nuclear Information System (INIS)

    Khan, A.M.; Mahfooz, M.; Hanumaiah, B.; Ganesh; Siddappa, K.

    2006-01-01

    In this paper we report on a control system developed to tune the magnetron frequency to get the maximum beam pulse in the microtron (electron accelerator facility at Mangalore University). The control system so designed consists of a microcontroller, a phase locked loop (PLL) and a digital to analog converter (DAC) to control the magnetron frequency. The voltage value given by the microcontroller through the DAC decides the reference frequency. The PLL gives the error voltage whenever there is difference between the reference and the magnetron frequencies. The microcontroller unit tracks the error voltage and tunes the magnetron with the help of a tuner mechanism connected through a stepper motor. The microcontroller also monitors the beam current level and accordingly adjusts the reference frequency to successfully tune the magnetron. (author)

  11. Planar Dirac diffusion

    International Nuclear Information System (INIS)

    Leo, Stefano de; Rotelli, Pietro

    2009-01-01

    We present the results of the planar diffusion of a Dirac particle by step and barrier potentials, when the incoming wave impinges at an arbitrary angle with the potential. Except for right-angle incidence this process is characterized by the appearance of spin flip terms. For the step potential, spin flip occurs for both transmitted and reflected waves. However, we find no spin flip in the transmitted barrier result. This is surprising because the barrier result may be derived directly from a two-step calculation. We demonstrate that the spin flip cancellation indeed occurs for each ''particle'' (wave packet) contribution. (orig.)

  12. Simplifying massive planar subdivisions

    DEFF Research Database (Denmark)

    Arge, Lars; Truelsen, Jakob; Yang, Jungwoo

    2014-01-01

    We present the first I/O- and practically-efficient algorithm for simplifying a planar subdivision, such that no point is moved more than a given distance εxy and such that neighbor relations between faces (homotopy) are preserved. Under some practically realistic assumptions, our algorithm uses ....... For example, for the contour map simplification problem it is significantly faster than the previous algorithm, while obtaining approximately the same simplification factor. Read More: http://epubs.siam.org/doi/abs/10.1137/1.9781611973198.3...

  13. Dynamic Planar Convex Hull

    DEFF Research Database (Denmark)

    Brodal, Gerth Stølfting; Jacob, Rico

    2002-01-01

    In this paper we determine the computational complexity of the dynamic convex hull problem in the planar case. We present a data structure that maintains a finite set of n points in the plane under insertion and deletion of points in amortized O(log n) time per operation. The space usage of the d......In this paper we determine the computational complexity of the dynamic convex hull problem in the planar case. We present a data structure that maintains a finite set of n points in the plane under insertion and deletion of points in amortized O(log n) time per operation. The space usage...... of the data structure is O(n). The data structure supports extreme point queries in a given direction, tangent queries through a given point, and queries for the neighboring points on the convex hull in O(log n) time. The extreme point queries can be used to decide whether or not a given line intersects...... the convex hull, and the tangent queries to determine whether a given point is inside the convex hull. We give a lower bound on the amortized asymptotic time complexity that matches the performance of this data structure....

  14. Spectroelectrochemical sensing: planar waveguides

    Energy Technology Data Exchange (ETDEWEB)

    Ross, Susan E.; Shi Yining; Seliskar, Carl J.; Heineman, William R

    2003-09-30

    The spectroelectrochemical sensor combines in a single device electrochemistry, spectroscopy, and selective partitioning into a film, giving improved selectivity for applications that involve complex samples. Sensing is based on the change in optical signal that accompanies electrochemical modulation of analyte that has partitioned into the film. Two classes of optical quality chemically-selective films based on two different host materials, namely, sol-gel processed silica and cross-linked poly(vinyl alcohol) have been developed. Films are typically 400-700 nm thick. Three types of sensor platforms are discussed: a multiple internal reflection (MIR) optic consisting of a bilayer of an indium tin oxide (ITO) optically transparent electrode deposited on a 1-mm thick glass substrate, a planar waveguide in which a potassium ion-exchanged BK7 glass waveguide (5-9 {mu}m thick) was over-coated with a thin film of ITO, and a planar waveguide in which a potassium ion-exchanged BK7 glass waveguide channel was formed and a pair of electrodes deposited along side the channel. These sensors were evaluated with ferrocyanide and a selective film of PDMDAAC-SiO{sub 2}, where PDMDAAC=poly(dimethyl diallylammonium chloride)

  15. Spectroelectrochemical sensing: planar waveguides

    International Nuclear Information System (INIS)

    Ross, Susan E.; Shi Yining; Seliskar, Carl J.; Heineman, William R.

    2003-01-01

    The spectroelectrochemical sensor combines in a single device electrochemistry, spectroscopy, and selective partitioning into a film, giving improved selectivity for applications that involve complex samples. Sensing is based on the change in optical signal that accompanies electrochemical modulation of analyte that has partitioned into the film. Two classes of optical quality chemically-selective films based on two different host materials, namely, sol-gel processed silica and cross-linked poly(vinyl alcohol) have been developed. Films are typically 400-700 nm thick. Three types of sensor platforms are discussed: a multiple internal reflection (MIR) optic consisting of a bilayer of an indium tin oxide (ITO) optically transparent electrode deposited on a 1-mm thick glass substrate, a planar waveguide in which a potassium ion-exchanged BK7 glass waveguide (5-9 μm thick) was over-coated with a thin film of ITO, and a planar waveguide in which a potassium ion-exchanged BK7 glass waveguide channel was formed and a pair of electrodes deposited along side the channel. These sensors were evaluated with ferrocyanide and a selective film of PDMDAAC-SiO 2 , where PDMDAAC=poly(dimethyl diallylammonium chloride)

  16. Design of special planar linkages

    CERN Document Server

    Zhao, Jing-Shan; Ma, Ning; Chu, Fulei

    2013-01-01

    Planar linkages play a very important role in mechanical engineering. As the simplest closed chain mechanisms, planar four-bar linkages are widely used in mechanical engineering, civil engineering and aerospace engineering.Design of Special Planar Linkages proposes a uniform design theory for planar four-bar linkages. The merit of the method proposed in this book is that it allows engineers to directly obtain accurate results when there are such solutions for the specified n precise positions; otherwise, the best approximate solutions will be found. This book discusses the kinematics and reach

  17. Implementation and initial test result of a prototype solid state modulator for pulsed magnetron

    International Nuclear Information System (INIS)

    Dake, Vishal; Mangalvedekar, H.A.; Tillu, Abhijit; Dixit, Kavita P.; Sarukte, Hemant

    2014-01-01

    A solid-state modulator rated for 50 kV, 120A, 4μs and 250 Hz has been designed. The discharging circuit of the modulator is being tested at ∼ 33 kV, 40-80A, at a maximum pulse repetition rate of 30 pps. The paper discusses development and testing of prototype discharging circuit on resistive load and magnetron. The technique used for measurement of pulse transformer leakage inductance, distributed capacitance and stray primary circuit series inductance will also be discussed in detail. It is necessary to have Energy Storage Capacitors with low ESL for these applications (ESL < 40 nH). The method used for evaluating the ESL of locally available metalized polypropylene capacitors will also be presented. (author)

  18. Implementation and initial test result of a prototype solid state modulator for pulsed magnetron

    Energy Technology Data Exchange (ETDEWEB)

    Dake, Vishal; Mangalvedekar, H.A., E-mail: vishaldake90@gmail.com [Veermata Jijabai Technological Institute, Mumbai (India); Tillu, Abhijit; Dixit, Kavita P.; Sarukte, Hemant [Accelerator and Pulse Power Division, Bhabha Atomic Research Centre, Mumbai (India)

    2014-07-01

    A solid-state modulator rated for 50 kV, 120A, 4μs and 250 Hz has been designed. The discharging circuit of the modulator is being tested at ∼ 33 kV, 40-80A, at a maximum pulse repetition rate of 30 pps. The paper discusses development and testing of prototype discharging circuit on resistive load and magnetron. The technique used for measurement of pulse transformer leakage inductance, distributed capacitance and stray primary circuit series inductance will also be discussed in detail. It is necessary to have Energy Storage Capacitors with low ESL for these applications (ESL < 40 nH). The method used for evaluating the ESL of locally available metalized polypropylene capacitors will also be presented. (author)

  19. Fabrication of hydroxyapatite thin films for biomedical applications using RF magnetron sputtering

    International Nuclear Information System (INIS)

    Yamaguchi, Tetsuro; Tanaka, Yoshikazu; Ide-Ektessabi, Ari

    2006-01-01

    The calcium phosphate thin films for medical applications require similar chemical properties as those of natural bone as well as a uniform surface without any defect, such as cracks and pinholes. In this study, the calcium phosphate thin films were fabricated using RF magnetron sputtering deposition technique at discharge power of 200W, 300W and 400W. The target used for the deposition was sintered HAp. RBS analysis showed that the Ca/P ratio increased with the discharge power becoming close to that of Ca/P=1.67 in ideal HAp. XPS analysis revealed the presence of PO 4 3- and OH - bonds in the calcium phosphate films fabricated. The chemical properties of the calcium phosphate thin films were similar to those of ideal HAp. The AFM results revealed that the thin films prepared had a uniform surface

  20. Mechanical and tribological properties of crystalline aluminum nitride coatings deposited on stainless steel by magnetron sputtering

    Science.gov (United States)

    Choudhary, R. K.; Mishra, S. C.; Mishra, P.; Limaye, P. K.; Singh, K.

    2015-11-01

    Aluminum nitride (AlN) coating is a potential candidate for addressing the problems of MHD pressure drop, tritium permeation and liquid metal corrosion of the test blanket module of fusion reactor. In this work, AlN coatings were grown on stainless steel by magnetron sputtering. Grazing incidence X-ray diffraction measurement revealed that formation of mixed phase (wurtzite and rock salt) AlN was favored at low discharge power and substrate negative biasing. However, at sufficiently high discharge power and substrate bias, (100) oriented wurtzite AlN was obtained. Secondary ion mass spectroscopy showed presence of oxygen in the coatings. The highest value of hardness and Young's modulus were 14.1 GPa and 215 GPa, respectively. Scratch test showed adhesive failure at a load of about 20 N. Wear test showed improved wear resistance of the coatings obtained at higher substrate bias.

  1. Effect of interelectrode distance on dc magnetron current-pressure characteristics

    Science.gov (United States)

    Mankelevich, Yu A.; Pal, A. F.; Ryabinkin, A. N.; Serov, A. O.

    2018-01-01

    The current-pressure (I-P) non-monotonic characteristic in the magnetron discharge dc in argon at different interelectrode distances was investigated. The ion spatial distribution was obtained with optical emission spectroscopy and the characteristic dimensions of the discharge structure in near cathode region were determined. It is shown that decreasing the distance between electrodes does not affect the shape and position of the nonmonotonic part of I-P characteristic until this distance become comparable with the dimensions of the ionization region near cathode. The existence of non-monotonic part of I-P characteristic is determined by the processes in the near cathode region and is probably unrelated with the cold electron transfer in the rest of the plasma.

  2. DC magnetron sputtering prepared Ag-C thin film anode for thin film lithium ion microbatteries

    International Nuclear Information System (INIS)

    Li, Y.; Tu, J.P.; Shi, D.Q.; Huang, X.H.; Wu, H.M.; Yuan, Y.F.; Zhao, X.B.

    2007-01-01

    An Ag-C thin film was prepared by DC magnetron co-sputtering, using pure silver and graphite as the targets. The microstructure and morphology of the deposited thin film were characterized by X-ray diffraction (XRD) and transmission electron microscopy (TEM). Electrochemical performances of the Ag-C thin film anode were investigated by means of discharge/charge and cyclic voltammogram (CV) tests in model cells. The electrochemical impedance spectrum (EIS) characteristics and the chemical diffusion coefficient, D Li of the Ag-C thin film electrode at different discharging states were discussed. It was believed that the excellent cycling performance of the Ag-C electrode was ascribed to the good conductivity of silver and the volume stability of the thin film

  3. Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields

    International Nuclear Information System (INIS)

    Brenning, N; Huo, C; Raadu, M A; Lundin, D; Helmersson, U; Vitelaru, C; Stancu, G D; Minea, T

    2012-01-01

    The lower deposition rate for high power impulse magnetron sputtering (HiPIMS) compared with direct current magnetron sputtering for the same average power is often reported as a drawback. The often invoked reason is back-attraction of ionized sputtered material to the target due to a substantial negative potential profile, sometimes called an extended presheath, from the location of ionization toward the cathode. Recent studies in HiPIMS devices, using floating-emitting and swept-Langmuir probes, show that such extended potential profiles do exist, and that the electric fields E z directed toward the target can be strong enough to seriously reduce ion transport to the substrate. However, they also show that the potential drops involved can vary by up to an order of magnitude from case to case. There is a clear need to understand the underlying mechanisms and identify the key discharge variables that can be used for minimizing the back-attraction. We here present a combined theoretical and experimental analysis of the problem of electric fields E z in the ionization region part of HiPIMS discharges, and their effect on the transport of ionized sputtered material. In particular, we have investigated the possibility of a ‘sweet spot’ in parameter space in which the back-attraction of ionized sputtered material is low. It is concluded that a sweet spot might possibly exist for some carefully optimized discharges, but probably in a rather narrow window of parameters. As a measure of how far a discharge is from such a window, a Townsend product Π Townsend is proposed. A parametric analysis of Π Townsend shows that the search for a sweet spot is complicated by the fact that contradictory demands appear for several of the externally controllable parameters such as high/low working gas pressure, short/long pulse length, high/low pulse power and high/low magnetic field strength. (paper)

  4. Shoulder replacement - discharge

    Science.gov (United States)

    Total shoulder arthroplasty - discharge; Endoprosthetic shoulder replacement - discharge; Partial shoulder replacement - discharge; Partial shoulder arthroplasty - discharge; Replacement - shoulder - discharge; Arthroplasty - shoulder - discharge

  5. Planar elliptic growth

    Energy Technology Data Exchange (ETDEWEB)

    Mineev, Mark [Los Alamos National Laboratory

    2008-01-01

    The planar elliptic extension of the Laplacian growth is, after a proper parametrization, given in a form of a solution to the equation for areapreserving diffeomorphisms. The infinite set of conservation laws associated with such elliptic growth is interpreted in terms of potential theory, and the relations between two major forms of the elliptic growth are analyzed. The constants of integration for closed form solutions are identified as the singularities of the Schwarz function, which are located both inside and outside the moving contour. Well-posedness of the recovery of the elliptic operator governing the process from the continuum of interfaces parametrized by time is addressed and two examples of exact solutions of elliptic growth are presented.

  6. Dynamic Planar Convex Hull

    DEFF Research Database (Denmark)

    Jacob, Riko

    We determine the computational complexity of the dynamic convex hull problem in the planar case. We present a data structure that maintains a finite set of n points in the plane under insertion and deletion of points in amortized O(log n) time per operation. The space usage of the data structure...... is O(n). The data structure supports extreme point queries in a given direction, tangent queries through a given point, and queries for the neighboring points on the convex hull in O(log n) time. The extreme point queries can be used to decide whether or not a given line intersects the convex hull......, and the tangent queries to determine whether a given point is inside the convex hull. The space usage of the data structure is O(n). We give a lower bound on the amortized asymptotic time complexity that matches the performance of this data structure....

  7. Phase and Frequency Locked Magnetrons for SRF Sources

    International Nuclear Information System (INIS)

    Neubauer, M.; Johnson, R.P.; Popovic, M.; Moretti, A.

    2009-01-01

    Magnetrons are low-cost highly-efficient microwave sources, but they have several limitations, primarily centered about the phase and frequency stability of their output. When the stability requirements are low, such as for medical accelerators or kitchen ovens, magnetrons are the very efficient power source of choice. But for high energy accelerators, because of the need for frequency and phase stability - proton accelerators need 1-2 degrees source phase stability, and electron accelerators need .1-.2 degrees of phase stability - they have rarely been used. We describe a novel variable frequency cavity technique which will be utilized to phase and frequency lock magnetrons.

  8. Improved Dynamic Planar Point Location

    DEFF Research Database (Denmark)

    Brodal, Gerth Stølting; Arge, Lars; Georgiadis, Loukas

    2006-01-01

    We develop the first linear-space data structures for dynamic planar point location in general subdivisions that achieve logarithmic query time and poly-logarithmic update time.......We develop the first linear-space data structures for dynamic planar point location in general subdivisions that achieve logarithmic query time and poly-logarithmic update time....

  9. Contracting a planar graph efficiently

    DEFF Research Database (Denmark)

    Holm, Jacob; Italiano, Giuseppe F.; Karczmarz, Adam

    2017-01-01

    the data structure, we can achieve optimal running times for decremental bridge detection, 2-edge connectivity, maximal 3-edge connected components, and the problem of finding a unique perfect matching for a static planar graph. Furthermore, we improve the running times of algorithms for several planar...

  10. Unbalanced Cylindrical Magnetron for Accelerating Cavities Coating

    CERN Document Server

    Rosaz, Guillaume; Calatroni, Sergio; Sublet, Alban; Tobarelli, Mauro

    2016-01-01

    We report in this paper the design and qualification of a cylindrical unbalanced magnetron source. The dedicated magnetic assemblies were simulated using a finite element model. A hall-effect magnetic probe was then used to characterize those assemblies and compared to the theoretical magnet profiles. These show a good agreement between the expected and actual values. the qualification of the different magnetic assemblies was then performed by measuring the ion flux density reaching the surface of the sample to be coated using a commercial retarding field energy analyzer. The strongest unbalanced configuration shows an increase from 0.016A.cm^-2 to 0.074A.cm^-2 of the ion flux density reaching the sample surface compared to the standard balanced configuration for a pressure 5.10^-3 mbar and a plasma source power of 300W.

  11. Characterization and Optimization of the Magnetron Directional Amplifier

    National Research Council Canada - National Science Library

    Hatfield, Michael

    1999-01-01

    .... A conventional microwave oven magnetron may be converted into a two-port amplifier capable of delivering over 30 dB of gain, while remaining phase-locked to the input signal over a wide frequency range...

  12. Life test on indigenous s-band pulsed magnetron

    International Nuclear Information System (INIS)

    Wanmode, Y.D.; Shrivastava, P.; Hannurkar, P.R.

    1999-01-01

    A 2 MW S-band pulsed magnetron has been developed under joint collaboration between CAT and CEERI. In this development effort several lab prototypes were evaluated on 2 MW microwave test facility developed at CAT. One magnetron is subjected to life test. The present paper describes the setup and procedures used for life test. Various observations and corrections made during the life tests are also described. Results of the tests are discussed. (author)

  13. Inverted relativistic magnetron with a single axial output

    International Nuclear Information System (INIS)

    Ballard, W.P.; Earley, L.M.; Wharton, C.B.

    1986-01-01

    A twelve vane, 1 MV, S-band magnetron has been designed and tested. An inverted design was selected to minimize the parasitic axial electron losses. The stainless steel anode is approximately one wavelength long. One end is partially short-circuited to rf, while the other end has a mode transformer to couple the 3.16 GHz π-mode out into a TM 01 circular waveguide. The magnetron has a loaded output Q of about 100. Operation at 1 MV, 0.31 T, 5 kA routinely produces approx.150 MW peak rms and 100 MW average rms with pulse lengths adjustable from 5 to 70 ns. The microwave power pulse has a rise time of approx.2 ns. The output power is diagnosed using four methods: calorimetry, two circular-waveguide directional couplers installed on the magnetron, two transmitting-receiving systems, and gaseous breakdown. Operation at other voltages and magnetic fields shows that the oscillation frequency is somewhat dependent on the magnetron current. Frequency changes of approx.20 MHz/kA occur as the operating conditions are varied. A series of experiments varying the anode conductivity, the electron emission profile, and the output coupling transformer design showed that none of these significantly increased the output power. Therefore, we have concluded that this magnetron operates in saturation. Because of the anode lifetime and repeatability, this magnetron has the potential to be repetitively pulsed. 36 refs., 16 figs

  14. Contact planarization of ensemble nanowires

    Science.gov (United States)

    Chia, A. C. E.; LaPierre, R. R.

    2011-06-01

    The viability of four organic polymers (S1808, SC200, SU8 and Cyclotene) as filling materials to achieve planarization of ensemble nanowire arrays is reported. Analysis of the porosity, surface roughness and thermal stability of each filling material was performed. Sonication was used as an effective method to remove the tops of the nanowires (NWs) to achieve complete planarization. Ensemble nanowire devices were fully fabricated and I-V measurements confirmed that Cyclotene effectively planarizes the NWs while still serving the role as an insulating layer between the top and bottom contacts. These processes and analysis can be easily implemented into future characterization and fabrication of ensemble NWs for optoelectronic device applications.

  15. Planar graphs theory and algorithms

    CERN Document Server

    Nishizeki, T

    1988-01-01

    Collected in this volume are most of the important theorems and algorithms currently known for planar graphs, together with constructive proofs for the theorems. Many of the algorithms are written in Pidgin PASCAL, and are the best-known ones; the complexities are linear or 0(nlogn). The first two chapters provide the foundations of graph theoretic notions and algorithmic techniques. The remaining chapters discuss the topics of planarity testing, embedding, drawing, vertex- or edge-coloring, maximum independence set, subgraph listing, planar separator theorem, Hamiltonian cycles, and single- or multicommodity flows. Suitable for a course on algorithms, graph theory, or planar graphs, the volume will also be useful for computer scientists and graph theorists at the research level. An extensive reference section is included.

  16. Deposition of lead-silicate glassy thin coatings by RF magnetron sputtering: Correlation between deposition parameters and electrical and structural properties

    International Nuclear Information System (INIS)

    Rigato, V.; Maggioni, G.; Boscarino, D.; Della Mea, G.; Univ. di Trento, Mesiano

    1996-01-01

    Lead-silicate glassy thin films produced by means of Reactive Radio Frequency Magnetron Sputtering have found recent application in the development of MicroStrip Gas Chambers radiation detectors. Here, thin films (100--400 nm) of lead silicate glass have been deposited by RF magnetron sputtering in Ar plasma at different discharge conditions. The interaction of the sputtered species with the gas atoms during the transport process through the discharge region and the kinetics of growth of the films have been investigated as a function of the target composition and of the substrate temperature. This study demonstrates the possibility of controlling the surface electrical resistance of the films in a wide range of values ranging from 10 12 to 10 17 Ω/□ during the film growth

  17. On the control of deposition process for enhanced mechanical properties of nc-TiC/a-C: H coatings with DC magnetron sputtering at low or high ion flux

    Czech Academy of Sciences Publication Activity Database

    Souček, P.; Schmidtová, T.; Zábranský, L.; Buršíková, V.; Vašina, P.; Caha, O.; Buršík, Jiří; Peřina, Vratislav; Mikšová, Romana; Pei, Y.; de Hosson, J. T. M.

    Roč. 255, 25 September (2014), s. 8-14 ISSN 0257-8972 Institutional support: RVO:68081723 ; RVO:61389005 Keywords : enhanced mechanical properties * ion flux on the substrate * magnetron sputtering Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 1.998, year: 2014

  18. Flat panel planar optic display

    Energy Technology Data Exchange (ETDEWEB)

    Veligdan, J.T. [Brookhaven National Lab., Upton, NY (United States). Dept. of Advanced Technology

    1994-11-01

    A prototype 10 inch flat panel Planar Optic Display, (POD), screen has been constructed and tested. This display screen is comprised of hundreds of planar optic class sheets bonded together with a cladding layer between each sheet where each glass sheet represents a vertical line of resolution. The display is 9 inches wide by 5 inches high and approximately 1 inch thick. A 3 milliwatt HeNe laser is used as the illumination source and a vector scanning technique is employed.

  19. Deposition Rates of High Power Impulse Magnetron Sputtering: Physics and Economics

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2009-11-22

    Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase of the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes to due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes of the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction of the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits considered.

  20. Deposition rates of high power impulse magnetron sputtering: Physics and economics

    International Nuclear Information System (INIS)

    Anders, Andre

    2010-01-01

    Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase in the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes in the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction in the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits are considered.

  1. Composite SiO.sub.x./sub./hydrocarbon plasma polymer films prepared by RF magnetron sputtering of SiO.sub.2./sub. and polyethylene or polypropylene

    Czech Academy of Sciences Publication Activity Database

    Pihosh, Y.; Biederman, H.; Slavínská, D.; Kousal, J.; Choukourov, A.; Trchová, Miroslava; Macková, Anna; Boldyryeva, Hanna

    2006-01-01

    Roč. 81, 1-4 (2006), s. 32-37 ISSN 0042-207X R&D Projects: GA MŠk 1P05ME754 Institutional research plan: CEZ:AV0Z40500505; CEZ:AV0Z10480505 Keywords : composite films * magnetron * sputtering Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 0.834, year: 2006

  2. Composite SiOx/fluorocarbon plasma polymer films prepared by r.f. magnetron sputtering of SiO2 and PTFE

    Czech Academy of Sciences Publication Activity Database

    Pihosh, Y.; Biederman, H.; Slavínská, D.; Kousal, J.; Choukourov, A.; Trchová, Miroslava; Macková, Anna; Boldyryeva, Hanna

    2006-01-01

    Roč. 81, 1-4 (2006), s. 38-44 ISSN 0042-207X R&D Projects: GA MŠk OC 527.10; GA MŠk ME 553 Institutional research plan: CEZ:AV0Z40500505; CEZ:AV0Z10480505 Keywords : composite films * magnetron * sputtering Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 0.834, year: 2006

  3. Development of new cylindrical magnetrons for industrial use

    International Nuclear Information System (INIS)

    Clayton, B.

    2000-09-01

    A number of alternative techniques were considered and tested with a view to the construction of a cylindrical sputtering device. This device was required to be capable of depositing tribological coatings inside approximately cylindrical substrates of diameters less than 100mm, in an industrial situation. A cylindrical magnetron device was designed, and constructed as a prototype, using a magnetic assembly inside a cylindrical target with outside diameter (o.d.) 40mm. Two alternative magnetic assemblies were tested, and found to have complimentary advantages. The magnetron characteristics of the device were tested, as were key properties (such as adhesion level and hardness) of the coatings deposited. In all cases good results were obtained. A 22mm o.d. device based on the same design was shown to operate, but with less satisfactory characteristics. In an attempt to improve the miniaturised design, the feasibility of gas cooling (rather than water cooling) the cylindrical magnetron was demonstrated. A system incorporating four 40mm o.d. cylindrical magnetrons was designed, constructed and briefly tested. This was intended to prove the feasibility of using a multi-magnetron system to reduce the cost to coat. Its dimensions and design were tailored to an industrially specified engine block. In use the plasma rings formed on the 40mm magnetron target surfaces during operation were found to be of unequal intensities, especially on the shorter magnetron design used in the four-fold system. In an attempt to tackle this problem, a finite element model of the magnetic field generated by the magnetic assembly was built, run and verified. Changes were made to this model, and a new .magnet assembly was built and tested based on the results obtained. This did not lead to a final solution of the problem, but has set bounds within which the solution must lie. (author)

  4. Evolution of film temperature during magnetron sputtering

    International Nuclear Information System (INIS)

    Shaginyan, L.R.; Han, J.G.; Shaginyan, V.R.; Musil, J.

    2006-01-01

    We report on the results of measurements of the temperature T F surf which developed on the surface of films deposited by magnetron sputtering of chromium and copper targets on cooling and non-cooling silicon substrates. The T F surf and substrate temperature (T s ) were simultaneously measured using high-resolution IR camera and thermocouple, respectively. We revealed that the T F surf steeply grows, keeps constant when it achieves saturation level, and rapidly drops to the value of the T s after stopping the deposition. At the same time, the T s either does not change for the case of cooling substrate or increases to a certain level for noncooling substrate. However, in both cases the T s remains several times lower than the T F surf . The T F surf is proportional to the flux of energy delivered to the growth surface by sputtered atoms and other fast particles, weakly depends on the depositing metal and can achieve several hundreds of deg. C. This phenomenon is explained by a model assuming formation of a hot thin surface layer (HTSL) on the top of the growing film, which exists only during film deposition and exhibits extremely low thermal conductivity. Due to this unique property the temperature T F surf of HTSL is several times higher than the T s . Variations in the T F surf fairly correlate with structure changes of Cr films along thickness investigated in detail previously

  5. NIPPLE DISCHARGE

    Directory of Open Access Journals (Sweden)

    T. N. Bukharova

    2008-01-01

    Full Text Available According to the data available in the literature, as high as 50% of women have benign breast tumors frequently accompanied by nip- ple discharge. Nipple discharge may be serous, bloody, purulent, and colostric. The most common causes are breast abscess, injury, drugs, prolactinoma, intraductal pappiloma, ductal ectasia, intraductal cancer (not more than 10%.

  6. Reactive magnetron sputtering deposition of bismuth tungstate onto titania nanoparticles for enhancing visible light photocatalytic activity

    Energy Technology Data Exchange (ETDEWEB)

    Ratova, Marina, E-mail: marina_ratova@hotmail.com [Surface Engineering Group, School of Engineering, Manchester Metropolitan University, Manchester, M1 5GD (United Kingdom); Kelly, Peter J.; West, Glen T. [Surface Engineering Group, School of Engineering, Manchester Metropolitan University, Manchester, M1 5GD (United Kingdom); Tosheva, Lubomira; Edge, Michele [School of Science and the Environment, Manchester Metropolitan University, Manchester M1 5GD (United Kingdom)

    2017-01-15

    Highlights: • Bismuth tungstate coatings were deposited by reactive magnetron sputtering. • Oscillating bowl was introduced to the system to enable coating of nanopartulates. • Deposition of Bi{sub 2}WO{sub 6} enhanced visible light activity of titania nanoparticles. • The best results were obtained for coating with Bi:W ratio of approximately 2:1. • Deposition of Bi{sub 2}WO{sub 6} onto TiO{sub 2} resulted in more efficient electron-hole separation. - Abstract: Titanium dioxide − bismuth tungstate composite materials were prepared by pulsed DC reactive magnetron sputtering of bismuth and tungsten metallic targets in argon/oxygen atmosphere onto anatase and rutile titania nanoparticles. The use of an oscillating bowl placed beneath the two magnetrons arranged in a co-planar closed field configuration enabled the deposition of bismuth tungstate onto loose powders, rather than a solid substrate. The atomic ratio of the bismuth/tungsten coatings was controlled by varying the power applied to each target. The effect of the bismuth tungstate coatings on the phase, optical and photocatalytic properties of titania was investigated by X-ray diffraction, energy-dispersive X-ray spectroscopy (EDX), Brunauer–Emmett–Teller (BET) surface area measurements, transmission electron microscopy (TEM), UV–vis diffuse reflectance spectroscopy and an acetone degradation test. The latter involved measurements of the rate of CO{sub 2} evolution under visible light irradiation of the photocatalysts, which indicated that the deposition of bismuth tungstate resulted in a significant enhancement of visible light activity, for both anatase and rutile titania particles. The best results were achieved for coatings with a bismuth to tungsten atomic ratio of 2:1. In addition, the mechanism by which the photocatalytic activity of the TiO{sub 2} nanoparticles was enhanced by compounding it with bismuth tungstate was studied by microwave cavity perturbation. The results of these

  7. Reactive dual magnetron sputtering for large area application

    International Nuclear Information System (INIS)

    Struempfel, J.

    2002-01-01

    Production lines for large area coating demand high productivity of reactive magnetron sputtering processes. Increased dynamic deposition rates for oxides and nitrides were already obtained by using of highly powered magnetrons in combination with advanced sputter techniques. However, besides high deposition rates the uniformity of such coatings has to be carefully considered. First the basics of reactive sputtering processes and dual magnetron sputtering are summarized. Different methods for process stabilization and control are commonly used for reactive sputtering. The Plasma Emission Monitor (PE M) offers the prerequisite for fast acting process control derived from the in-situ intensity measurements of a spectral line of the sputtered target material. Combined by multiple Plasma Emission Monitor control loops segmented gas manifolds are able to provide excellent thin film uniformity at high deposition rates. The Dual Magnetron allows a broad range of processing by different power supply modes. Medium frequency, DC and pulsed DC power supplies can be used for high quality layers. Whereas the large area coating of highly isolating layers like TiO 2 or SiO 2 is dominated by MF sputtering best results for coating with transparent conductive oxides are obtained by dual DC powering of the dual magnetron arrangement. (Author)

  8. Deposition of amino-rich thin films by RF magnetron sputtering of nylon

    Energy Technology Data Exchange (ETDEWEB)

    Kylian, O; Hanus, J; Choukourov, A; Kousal, J; SlavInska, D; Biederman, H, E-mail: ondrej.kylian@gmail.co [Charles University, Faculty of Mathematics and Physics, V Holesovickach 2, Prague 8, 180 00 (Czech Republic)

    2009-07-21

    RF magnetron sputtering of a nylon target in different gas mixtures was studied in order to evaluate the capability of this process to deposit amino-rich coatings needed in a wide range of biomedical applications. It has been demonstrated that both the deposition rate of the coatings and the surface density of primary amino groups are strongly linked with working gas mixture composition. From this point of view, a sufficiently high deposition rate as well as the highest amine efficiency reaching a NH{sub 2}/C value of 18% was observed in the N{sub 2}/H{sub 2} discharge, which leads to the surface exhibiting a high rate of protein adsorption. (fast track communication)

  9. Micromachined Planar Supercapacitor with Interdigital Buckypaper Electrodes

    Directory of Open Access Journals (Sweden)

    Yun-Ting Chen

    2018-05-01

    Full Text Available In this work, a flexible micro-supercapacitor with interdigital planar buckypaper electrodes is presented. A simple fabrication process involving vacuum filtration method and SU-8 molding techniques is proposed to fabricate in-plane interdigital buckypaper electrodes on a membrane filter substrate. The proposed process exhibits excellent flexibility for future integration of the micro-supercapacitors (micro-SC with other electronic components. The device’s maximum specific capacitance measured using cyclic voltammetry was 107.27 mF/cm2 at a scan rate of 20 mV/s. The electrochemical stability was investigated by measuring the performance of charge-discharge at different discharge rates. Devices with different buckypaper electrode thicknesses were also fabricated and measured. The specific capacitance of the proposed device increased linearly with the buckypaper electrode thickness. The measured leakage current was approximately 9.95 µA after 3600 s. The device exhibited high cycle stability, with 96.59% specific capacitance retention after 1000 cycles. A Nyquist plot of the micro-SC was also obtained by measuring the impedances with frequencies from 1 Hz to 50 kHz; it indicated that the equivalent series resistance value was approximately 18 Ω.

  10. Influence of Magnetron Effect on Barium Hexaferrite Thin Layers

    International Nuclear Information System (INIS)

    Hassane, H.; Chatelon, J.P.; Rousseau, J.J; Siblini, A.; Kriga, A.

    2011-01-01

    In this paper, we study the effects of a magnet, located in the cathode, on barium hexaferrite thin films deposited by RF magnetron sputtering technique. During the process, these effects can modify thickness, roughness and stress of coatings. The characteristics of the deposited layers depend on the substrate position that is located opposite of magnetron cathode. In the m agnetron area , one can observe that the high stress can produce cracks or detachment of layers and the increasing of both depositing rate and surface roughness. After sputtering elaboration, barium hexaferrite films are in a compressive stress mode. But, after the post-deposition heat treatment these films are in a tensile stress mode. To improve the quality of BaM films, the subsrtate has to be set outside the magnetron area. (author)

  11. Very low pressure high power impulse triggered magnetron sputtering

    Science.gov (United States)

    Anders, Andre; Andersson, Joakim

    2013-10-29

    A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.

  12. Ileostomy - discharge

    Science.gov (United States)

    ... dried fruits (such as raisins), mushrooms, chunky relishes, coconut, and some Chinese vegetables. Tips for when no ... ask your doctor Living with your ileostomy Low-fiber diet Small bowel resection - discharge Total colectomy or ...

  13. Filamentary and diffuse barrier discharges

    International Nuclear Information System (INIS)

    Kogelschatz, U.

    2001-01-01

    Barrier discharges, sometimes also referred to as dielectric-barrier discharges or silent discharges, are characterized by the presence of at least one insulating layer in contact with the discharge between two planar or cylindrical electrodes connected to an ac power supply. The main advantage of this type of electrical discharge is, that non-equilibrium plasma conditions in atmospheric-pressure gases can be established in an economic and reliable way. This has led to a number of important applications including industrial ozone generation, surface modification of polymers, plasma chemical vapor deposition, excitation of CO 2 lasers, excimer lamps and, most recently, large-area flat plasma display panels. Depending on the application, the width of the discharge gap can range from less than 0.1 mm to about 100 mm and the applied frequency from below line frequency to several gigahertz. Typical materials used for the insulating layer (dielectric barrier) are glass, quartz, ceramics but also thin enamel or polymer layers

  14. Nanoporous zinc oxide films prepared by magnetron sputtering

    International Nuclear Information System (INIS)

    Ghimpu, L.; Lupan, O.; Popescu, L.; Tiginyanu, I.M.

    2011-01-01

    In this paper we demonstrate an inexpensive approach for the fabrication of nanoporous zinc oxide films by using magnetron sputtering. Study of the structural properties proves the crystallographic perfection of porous nanostructures and the possibility of its controlling by adjusting the technological parameters in the growth process. The XRD pattern of nanoporous ZnO films exhibits high intensity of the peaks relative to the background signal which is indicative of the ZnO hexagonal phase and a good crystallinity of the samples grown by magnetron sputtering.

  15. Plasma diagnostics during magnetron sputtering of aluminum doped zinc oxide

    DEFF Research Database (Denmark)

    Stamate, Eugen; Crovetto, Andrea; Sanna, Simone

    2016-01-01

    Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity of the f......Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity...

  16. Effect of nitrogen doping on TiO.sub.x./sub.N.sub.y./sub. thin film formation at reactive high-power pulsed magnetron sputtering

    Czech Academy of Sciences Publication Activity Database

    Straňák, Vítězslav; Quaas, M.; Bogdanowicz, R.; Steffen, H.; Wulff, H.; Hubička, Zdeněk; Tichý, M.; Hippler, R.

    2010-01-01

    Roč. 43, č. 28 (2010), s. 1-7 ISSN 0022-3727 R&D Projects: GA AV ČR KAN301370701; GA MŠk(CZ) 1M06002 Grant - others:AVČR(CZ) M100100915 Institutional research plan: CEZ:AV0Z10100522 Keywords : magnetron sputtering * TiO 2 * pulse discharge * XRD * band gap Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 2.105, year: 2010 http://iopscience.iop.org/0022-3727/43/28/285203/

  17. Mechanical and tribological properties of crystalline aluminum nitride coatings deposited on stainless steel by magnetron sputtering

    International Nuclear Information System (INIS)

    Choudhary, R.K.; Mishra, S.C.; Mishra, P.; Limaye, P.K.; Singh, K.

    2015-01-01

    Aluminum nitride (AlN) coating is a potential candidate for addressing the problems of MHD pressure drop, tritium permeation and liquid metal corrosion of the test blanket module of fusion reactor. In this work, AlN coatings were grown on stainless steel by magnetron sputtering. Grazing incidence X-ray diffraction measurement revealed that formation of mixed phase (wurtzite and rock salt) AlN was favored at low discharge power and substrate negative biasing. However, at sufficiently high discharge power and substrate bias, (100) oriented wurtzite AlN was obtained. Secondary ion mass spectroscopy showed presence of oxygen in the coatings. The highest value of hardness and Young's modulus were 14.1 GPa and 215 GPa, respectively. Scratch test showed adhesive failure at a load of about 20 N. Wear test showed improved wear resistance of the coatings obtained at higher substrate bias. - Highlights: • Crystalline AlN coatings obtained on stainless steel by reactive sputtering. • Wurtzite AlN formed at higher discharge power and higher substrate biasing. • Mixture of wurtzite and rock salt AlN formed at low power and low biasing. • Substrate negative biasing improved adhesion of AlN coatings. • Substrate negative biasing improved wear resistance and hardness of AlN coatings.

  18. Mechanical and tribological properties of crystalline aluminum nitride coatings deposited on stainless steel by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Choudhary, R.K., E-mail: crupeshbarc@gmail.com [Materials Processing Division, Bhabha Atomic Research Centre, Mumbai 400085 (India); Mishra, S.C.; Mishra, P. [Materials Processing Division, Bhabha Atomic Research Centre, Mumbai 400085 (India); Limaye, P.K. [Refuelling Technology Division, Bhabha Atomic Research Centre, Mumbai 400085 (India); Singh, K. [Fusion Reactor Materials Section, Bhabha Atomic Research Centre, Mumbai 400085 (India)

    2015-11-15

    Aluminum nitride (AlN) coating is a potential candidate for addressing the problems of MHD pressure drop, tritium permeation and liquid metal corrosion of the test blanket module of fusion reactor. In this work, AlN coatings were grown on stainless steel by magnetron sputtering. Grazing incidence X-ray diffraction measurement revealed that formation of mixed phase (wurtzite and rock salt) AlN was favored at low discharge power and substrate negative biasing. However, at sufficiently high discharge power and substrate bias, (100) oriented wurtzite AlN was obtained. Secondary ion mass spectroscopy showed presence of oxygen in the coatings. The highest value of hardness and Young's modulus were 14.1 GPa and 215 GPa, respectively. Scratch test showed adhesive failure at a load of about 20 N. Wear test showed improved wear resistance of the coatings obtained at higher substrate bias. - Highlights: • Crystalline AlN coatings obtained on stainless steel by reactive sputtering. • Wurtzite AlN formed at higher discharge power and higher substrate biasing. • Mixture of wurtzite and rock salt AlN formed at low power and low biasing. • Substrate negative biasing improved adhesion of AlN coatings. • Substrate negative biasing improved wear resistance and hardness of AlN coatings.

  19. Novel high power impulse magnetron sputtering enhanced by an auxiliary electrical field

    Energy Technology Data Exchange (ETDEWEB)

    Li, Chunwei, E-mail: lcwnefu@126.com, E-mail: xiubotian@163.com [College of Engineering and Technology, Northeast Forestry University, Harbin 150040 (China); State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001 (China); Tian, Xiubo, E-mail: lcwnefu@126.com, E-mail: xiubotian@163.com [State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001 (China)

    2016-08-15

    The high power impulse magnetron sputtering (HIPIMS) technique is a novel highly ionized physical vapor deposition method with a high application potential. However, the electron utilization efficiency during sputtering is rather low and the metal particle ionization rate needs to be considerably improved to allow for a large-scale industrial application. Therefore, we enhanced the HIPIMS technique by simultaneously applying an electric field (EF-HIPIMS). The effect of the electric field on the discharge process was studied using a current sensor and an optical emission spectrometer. Furthermore, the spatial distribution of the electric potential and electric field during the EF-HIPIMS process was simulated using the ANSYS software. The results indicate that a higher electron utilization efficiency and a higher particle ionization rate could be achieved. The auxiliary anode obviously changed the distribution of the electric potential and the electric field in the discharge region, which increased the plasma density and enhanced the degree of ionization of the vanadium and argon gas. Vanadium films were deposited to further compare both techniques, and the morphology of the prepared films was investigated by scanning electron microscopy. The films showed a smaller crystal grain size and a denser growth structure when the electric field was applied during the discharge process.

  20. Electrochemical characterization of silicon/graphene/MWCNT hybrid lithium-ion battery anodes produced via RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Toçoğlu, Ubeyd, E-mail: utocoglu@sakarya.edu.tr; Hatipoğlu, Gizem; Alaf, Miraç; Kayış, Fuat; Akbulut, Hatem

    2016-12-15

    Graphical abstract: Silicon/graphene/MWCNT hybrid composite anodes were produced via RF magnetron sputtering technique. CR2016 type coin cells were assembled for electrochemical characterization of anodes. Electrochemical characterizations of anodes were conducted via galvanostatic charge/discharge, cyclic voltammetry and electrochemical impedance spectroscopy techniques. - Highlights: • Silicon/graphene/MWCNT hybrid negative lithium ion battery anodes were produced via magnetron sputtering. • Structural and electrochemical characterizations of composite anodes were conducted comprehensively. • The capacity values exhibited by composite anodes were found to be almost more than two times compared to thin film anodes after 100 cycles. - Abstract: In this study it was aimed to enhance cycling performance of silicon lithium ion battery anodes via producing flexible Silicon/Graphene/MWCNT composite structures. The volumetric expansions, which are the primary obstacle that hinders the practical usage of silicon anodes, were tried to suppress using flexible graphene/MWCNT paper substrates. Moreover to achieve lightweight and high electrical conductive anodes, the advantage of graphene was aimed to be exploited. Silicon/graphene/MWCNT flexible composite anodes were produced via radio frequency (RF) magnetron sputtering technique. Graphene/MWCNT papers were produced with vacuum filtration technique as substrate for sputtering process. At coating process of papers constant sputtering power was applied. Phase analysis was conducted with X-ray diffraction (XRD) technique and Raman spectroscopy. Field emission scanning electron microscopy (FESEM). Cyclic voltammetry (CV) tests were carried out to reveal reversible reactions between silicon and lithium. Galvanostatic charge/discharge technique was employed to determine the cyclic performance of anodes. Electrochemical impedance spectroscopy technique was used to understand the relation between cyclic performance and

  1. Electrochemical characterization of silicon/graphene/MWCNT hybrid lithium-ion battery anodes produced via RF magnetron sputtering

    International Nuclear Information System (INIS)

    Toçoğlu, Ubeyd; Hatipoğlu, Gizem; Alaf, Miraç; Kayış, Fuat; Akbulut, Hatem

    2016-01-01

    Graphical abstract: Silicon/graphene/MWCNT hybrid composite anodes were produced via RF magnetron sputtering technique. CR2016 type coin cells were assembled for electrochemical characterization of anodes. Electrochemical characterizations of anodes were conducted via galvanostatic charge/discharge, cyclic voltammetry and electrochemical impedance spectroscopy techniques. - Highlights: • Silicon/graphene/MWCNT hybrid negative lithium ion battery anodes were produced via magnetron sputtering. • Structural and electrochemical characterizations of composite anodes were conducted comprehensively. • The capacity values exhibited by composite anodes were found to be almost more than two times compared to thin film anodes after 100 cycles. - Abstract: In this study it was aimed to enhance cycling performance of silicon lithium ion battery anodes via producing flexible Silicon/Graphene/MWCNT composite structures. The volumetric expansions, which are the primary obstacle that hinders the practical usage of silicon anodes, were tried to suppress using flexible graphene/MWCNT paper substrates. Moreover to achieve lightweight and high electrical conductive anodes, the advantage of graphene was aimed to be exploited. Silicon/graphene/MWCNT flexible composite anodes were produced via radio frequency (RF) magnetron sputtering technique. Graphene/MWCNT papers were produced with vacuum filtration technique as substrate for sputtering process. At coating process of papers constant sputtering power was applied. Phase analysis was conducted with X-ray diffraction (XRD) technique and Raman spectroscopy. Field emission scanning electron microscopy (FESEM). Cyclic voltammetry (CV) tests were carried out to reveal reversible reactions between silicon and lithium. Galvanostatic charge/discharge technique was employed to determine the cyclic performance of anodes. Electrochemical impedance spectroscopy technique was used to understand the relation between cyclic performance and

  2. The planar cubic Cayley graphs

    CERN Document Server

    Georgakopoulos, Agelos

    2018-01-01

    The author obtains a complete description of the planar cubic Cayley graphs, providing an explicit presentation and embedding for each of them. This turns out to be a rich class, comprising several infinite families. He obtains counterexamples to conjectures of Mohar, Bonnington and Watkins. The author's analysis makes the involved graphs accessible to computation, corroborating a conjecture of Droms.

  3. Development of a Planar Undulator

    International Nuclear Information System (INIS)

    Deyhim, Alex; Johnson, Eric; Kulesza, Joe; Lyndaker, Aaron; Waterman, Dave; Eisert, Dave; Green, Michael A.; Rogers, Greg; Blomqvist, K. Ingvar

    2007-01-01

    The design of a planar pure permanent magnet undulator is presented. The design requirements and mechanical difficulties for holding, positioning, and driving the magnetic arrays are explored. The structural, thermal, and electrical considerations that influenced the design are then analyzed. And finally detailed magnetic measurements are presented

  4. Casimir stress inside planar materials

    Science.gov (United States)

    Griniasty, Itay; Leonhardt, Ulf

    2017-09-01

    The Casimir force between macroscopic bodies is well understood, but not the Casimir force inside bodies. Guided by a physically intuitive picture, we develop the macroscopic theory of the renormalized Casimir stress inside planar materials (where the electromagnetic properties vary in one direction). Our theory may be applied in predicting how inhomogeneous fluids respond to Casimir forces.

  5. Approximation by planar elastic curves

    DEFF Research Database (Denmark)

    Brander, David; Gravesen, Jens; Nørbjerg, Toke Bjerge

    2016-01-01

    We give an algorithm for approximating a given plane curve segment by a planar elastic curve. The method depends on an analytic representation of the space of elastic curve segments, together with a geometric method for obtaining a good initial guess for the approximating curve. A gradient......-driven optimization is then used to find the approximating elastic curve....

  6. Poling of Planar Silica Waveguides

    DEFF Research Database (Denmark)

    Arentoft, Jesper; Kristensen, Martin; Jensen, Jesper Bo

    1999-01-01

    UV-written planar silica waveguides are poled using two different poling techniques, thermal poling and UV-poling. Thermal poling induces an electro-optic coefficient of 0.067 pm/V. We also demonstrate simultaneous UV-writing and UV-poling. The induced electro-optic effect shows a linear dependence...

  7. Origin of stress in radio frequency magnetron sputtered zinc oxide thin films

    International Nuclear Information System (INIS)

    Menon, Rashmi; Gupta, Vinay; Sreenivas, K.; Tan, H. H.; Jagadish, C.

    2011-01-01

    Highly c-axis oriented ZnO thin films have been deposited on silicon substrates by planar rf magnetron sputtering under varying pressure (10-50 mTorr) and oxygen percentage (50-100%) in the reactive gas (Ar + O 2 ) mixture. The as-grown films were found to be stressed over a wide range from -1 x 10 11 to -2 x 10 8 dyne/cm 2 that in turn depends strongly on the processing conditions, and the film becomes stress free at a unique combination of sputtering pressure and reactive gas composition. Raman spectroscopy and photoluminescence (PL) analyses identified the origin of stress as lattice distortion due to defects introduced in the ZnO thin film. FTIR study reveals that Zn-O bond becomes stronger with the increase in oxygen fraction in the reactive gas mixture. The lattice distortion or stress depends on the type of defects introduced during deposition. PL spectra show the formation of a shoulder in band emission with an increase in the processing pressure and are related to the presence of stress. The ratio of band emission to defect emission decreases with the increase in oxygen percentage from 50 to 100%. The studies show a correlation of stress with the structural, vibrational, and photoluminescence properties of the ZnO thin film. The systematic study of the stress will help in the fabrication of efficient devices based on ZnO film.

  8. Origin of stress in radio frequency magnetron sputtered zinc oxide thin films

    Science.gov (United States)

    Menon, Rashmi; Gupta, Vinay; Tan, H. H.; Sreenivas, K.; Jagadish, C.

    2011-03-01

    Highly c-axis oriented ZnO thin films have been deposited on silicon substrates by planar rf magnetron sputtering under varying pressure (10-50 mTorr) and oxygen percentage (50-100%) in the reactive gas (Ar + O2) mixture. The as-grown films were found to be stressed over a wide range from -1 × 1011 to -2 × 108 dyne/cm2 that in turn depends strongly on the processing conditions, and the film becomes stress free at a unique combination of sputtering pressure and reactive gas composition. Raman spectroscopy and photoluminescence (PL) analyses identified the origin of stress as lattice distortion due to defects introduced in the ZnO thin film. FTIR study reveals that Zn-O bond becomes stronger with the increase in oxygen fraction in the reactive gas mixture. The lattice distortion or stress depends on the type of defects introduced during deposition. PL spectra show the formation of a shoulder in band emission with an increase in the processing pressure and are related to the presence of stress. The ratio of band emission to defect emission decreases with the increase in oxygen percentage from 50 to 100%. The studies show a correlation of stress with the structural, vibrational, and photoluminescence properties of the ZnO thin film. The systematic study of the stress will help in the fabrication of efficient devices based on ZnO film.

  9. Variable Power, Short Microwave Pulses Generation using a CW Magnetron

    Directory of Open Access Journals (Sweden)

    CIUPA, R.

    2011-05-01

    Full Text Available Fine control of microwave power radiation in medical and scientific applications is a challenging task. Since a commercial Continuous Wave (CW magnetron is the most inexpensive microwave device available today on the market, it becomes the best candidate for a microwave power generator used in medical diathermy and hyperthermia treatments or high efficiency chemical reactions using microwave reactors as well. This article presents a new method for driving a CW magnetron with short pulses, using a modified commercial Zero Voltage Switching (ZVS inverter, software driven by a custom embedded system. The microwave power generator designed with this method can be programmed for output microwave pulses down to 1% of the magnetron's power and allows microwave low frequency pulse modulation in the range of human brain electrical activity, intended for medical applications. Microwave output power continuous control is also possible with the magnetron running in the oscillating area, using a dual frequency Pulse Width Modulation (PWM, where the low frequency PWM pulse is modulating a higher resonant frequency required by the ZVS inverter's transformer. The method presented allows a continuous control of both power and energy (duty-cycle at the inverter's output.

  10. Operational experience with the BNL magnetron H- source

    International Nuclear Information System (INIS)

    Witkover, R.L.

    1983-01-01

    A magnetron H - source with a grooved cathode has been in operation at the BNL Linac for over 18 months. The source has run at 5 pps with a 600 μsec pulse width for periods as long as 5 months. Its development and performance will be discussed

  11. RF Reactive Magnetron Sputter Deposition of Silicon Sub-Oxides

    NARCIS (Netherlands)

    Hattum, E.D. van

    2007-01-01

    RF reactive magnetron plasma sputter deposition of silicon sub oxide E.D. van Hattum Department of Physics and Astronomy, Faculty of Sciences, Utrecht University The work described in the thesis has been inspired and stimulated by the use of SiOx layers in the direct inductive printing technology,

  12. The role of magnetic energy on plasma localization during the glow discharge under reduced pressure

    Directory of Open Access Journals (Sweden)

    Chodun Rafal

    2016-06-01

    Full Text Available In this work, we present the first results of our research on the synergy of fields, electric and magnetic, in the initiation and development of glow discharge under reduced pressure. In the two-electrode system under reduced pressure, the breakdown voltage characterizes a minimum energy input of the electric field to initiate and sustain the glow discharge. The glow discharge enhanced by the magnetic field applied just above the surface of the cathode influences the breakdown voltage decreasing its value. The idea of the experiment was to verify whether the contribution of potential energy of the magnetic field applied around the cathode is sufficiently effective to locate the plasma of glow discharge to the grounded cathode, which, in fact, is the part of a vacuum chamber wall (the anode is positively biased in this case. In our studies, we used the grounded magnetron unit with positively biased anode in order to achieve favorable conditions for the deposition of thin films on fibrous substrates such as fabrics for metallization, assuming that locally applied magnetic field can effectively locate plasma. The results of our studies (Paschen curve with the participation of the magnetic field seem to confirm the validity of the research assumption. What is the most spectacular - the glow discharge was initiated between introduced into the chamber anode and the grounded cathode of magnetron ‘assisted’ by the magnetic field (discharge did not include the area of the anode, which is a part of the magnetron construction.

  13. Discharge Dialogue

    DEFF Research Database (Denmark)

    Horsbøl, Anders

    2012-01-01

    For several years, efforts have been made to strengthen collaboration between health professionals with different specializations and to improve patient transition from hospital to home (care). In the Danish health care system, these efforts have concentrated on cancer and heart diseases, whereas...... coordinator, employed at the hospital, is supposed to anticipate discharge and serve as mediator between the hospital and the municipal home care system. Drawing on methods from discourse and interaction analysis, the paper studies the practice of the discharge coordinator in two encounters between patients...... how the home context provides different resources for identification of patient needs and mutual decision making....

  14. Modeling and experimental studies of a side band power re-injection locked magnetron

    Science.gov (United States)

    Ye, Wen-Jun; Zhang, Yi; Yuan, Ping; Zhu, Hua-Cheng; Huang, Ka-Ma; Yang, Yang

    2016-12-01

    A side band power re-injection locked (SBPRIL) magnetron is presented in this paper. A tuning stub is placed between the external injection locked (EIL) magnetron and the circulator. Side band power of the EIL magnetron is reflected back to the magnetron. The reflected side band power is reused and pulled back to the central frequency. A phase-locking model is developed from circuit theory to explain the process of reuse of side band power in SBPRIL magnetron. Theoretical analysis proves that the side band power is pulled back to the central frequency of the SBPRIL magnetron, then the amplitude of the RF voltage increases and the phase noise performance is improved. Particle-in-cell (PIC) simulation of a 10-vane continuous wave (CW) magnetron model is presented. Computer simulation predicts that the frequency spectrum’s peak of the SBPRIL magnetron has an increase of 3.25 dB compared with the free running magnetron. The phase noise performance at the side band offset reduces 12.05 dB for the SBPRIL magnetron. Besides, the SBPRIL magnetron experiment is presented. Experimental results show that the spectrum peak rises by 14.29% for SBPRIL magnetron compared with the free running magnetron. The phase noise reduces more than 25 dB at 45-kHz offset compared with the free running magnetron. Project supported by the National Basic Research Program of China (Grant No. 2013CB328902) and the National Natural Science Foundation of China (Grant No. 61501311).

  15. Deposition and characterization of single magnetron deposited Fe:SnO{sub x} coatings

    Energy Technology Data Exchange (ETDEWEB)

    Kormunda, Martin, E-mail: martin.kormunda@ujep.cz [J.E. Purkinje University, Faculty of Science, Department of Physics, Ceske mladeze 8, 400 96 Usti nad Labem (Czech Republic); Fischer, Daniel; Hertwig, Andreas; Beck, Uwe [BAM Federal Institute for Materials Research and Testing, Division 6 4 Surface Technologies, Unter den Eichen 44-46, 12203 Berlin (Germany); Sebik, Matej; Pavlik, Jaroslav [J.E. Purkinje University, Faculty of Science, Department of Physics, Ceske mladeze 8, 400 96 Usti nad Labem (Czech Republic); Esser, Norbert [Leibniz-Institut für Analytische Wissenschaften — ISAS e.V., Department Berlin, Schwarzschildstr. 12, 12489 Berlin (Germany)

    2015-11-30

    Coatings deposited by magnetron co-sputtering from a single RF magnetron with a ceramic SnO{sub 2} target with iron inset in argon plasma were studied. The mass spectra of the process identified Sn{sup +} and SnO{sup +} species as the dominant species sputtered from the target, but no SnO{sub 2}{sup +} species were detected. The dominant positive ions in argon plasma are Ar{sup +} species. The only detected negative ions were O{sup −}. Sputtered neutral tin related species were not detected. Iron related species were also not detected because their concentration is below the detection limit. The concentration of iron dopant in the tin oxide coatings was controlled by the RF bias applied on the substrate holder while the discharge pressure also has some influence. The iron concentration was in the range from 0.9 at.% up to 19 at.% increasing with the substrate bias while the sheet resistivity decreases. The stoichiometry ratio of O/(Sn + Fe) in the coatings increased from 1.7 up to 2 in dependence on the substrate bias from floating bias (− 5 V) up to − 120 V of RF self-bias, respectively. The tin in the coatings was mainly bonded in Sn{sup 4+} state and iron was mainly in Fe{sup 2+} state when other tin bonding states were detected only in a small amounts. Iron bonding states in contrary to elemental compositions of the coatings were not influenced by the RF bias applied on the substrate. The coatings showed high transparency in the visible spectral range. However, an increased metallic behavior could be detected by using a higher RF bias for the deposition. The X-ray diffraction patterns and electron microscopy pictures made on the coatings confirmed the presence of an amorphous phase. - Highlights: • RF magnetron sputtering of SnO{sub 2} target with Fe inset in argon investigated by mass spectrometry • Optical properties of Fe doped SnO{sub x} coatings characterized • Analyses of overlapped XPS peaks at a spectrum from Fe doped SnO{sub x} coatings

  16. Manufacturing of planar ceramic interconnects

    Energy Technology Data Exchange (ETDEWEB)

    Armstrong, B.L.; Coffey, G.W.; Meinhardt, K.D.; Armstrong, T.R. [Pacific Northwest National Lab., Richland, WA (United States)

    1996-12-31

    The fabrication of ceramic interconnects for solid oxide fuel cells (SOFC) and separator plates for electrochemical separation devices has been a perennial challenge facing developers. Electrochemical vapor deposition (EVD), plasma spraying, pressing, tape casting and tape calendering are processes that are typically utilized to fabricate separator plates or interconnects for the various SOFC designs and electrochemical separation devices. For sake of brevity and the selection of a planar fuel cell or gas separation device design, pressing will be the only fabrication technique discussed here. This paper reports on the effect of the characteristics of two doped lanthanum manganite powders used in the initial studies as a planar porous separator for a fuel cell cathode and as a dense interconnect for an oxygen generator.

  17. Influence of discharge gap on the discharge stability in a short vacuum arc ion source

    Energy Technology Data Exchange (ETDEWEB)

    Chen, L. [Institute of Electronic Engineering, China Academy of Engineering Physics, Mianyang, Sichuan 621900 (China); Department of Engineering Physics, Tsinghua University, Beijing 100084 (China); Zhang, G. L.; Jin, D. Z.; Dai, J. Y. [Institute of Electronic Engineering, China Academy of Engineering Physics, Mianyang, Sichuan 621900 (China); Yang, L. [Institute of Nuclear Science and Technology, Louzhou University, Lanzhou, Gansu 730000 (China)

    2012-02-15

    The influence of the discharge gap between cathode and anode on the discharge stability in a short vacuum arc (SVA) ion source is presented in this paper. Planar cathode and cylindrical hollow anode made of titanium are investigated. There is a great need in present accelerator injection research for SVA source to produce the small deviation of the ion current beam. Current research shows that increasing the short discharge gap can reduce the level of ion current deviation and ion charge deviation from 29% and 31% to 15% and 17%, respectively. A microplasma plume generation mechanism in SVA and scanning electron microscopic results can be used to explain this interesting phenomenon.

  18. Planar-Processed Polymer Transistors.

    Science.gov (United States)

    Xu, Yong; Sun, Huabin; Shin, Eul-Yong; Lin, Yen-Fu; Li, Wenwu; Noh, Yong-Young

    2016-10-01

    Planar-processed polymer transistors are proposed where the effective charge injection and the split unipolar charge transport are all on the top surface of the polymer film, showing ideal device characteristics with unparalleled performance. This technique provides a great solution to the problem of fabrication limitations, the ambiguous operating principle, and the performance improvements in practical applications of conjugated-polymer transistors. © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  19. Titanium dioxide (TIO2) thin film and plasma properties in RF magnetron sputtering

    International Nuclear Information System (INIS)

    Ali, Riyaz Ahmad Mohamed; Nayan, Nafarizal

    2013-01-01

    Lately, titanium dioxide (TiO 2 ) films with anatase crystalline property received numerous attentions as unique material properties. There are wide applications of TiO 2 thin film such as for photocatalytic application in solar cell. In the present study, radio frequency (RF) magnetron sputtering technique has been used to produce high dense, homogeneously controllable film layer at low deposition temperature using titanium (Ti) target. The diameter of the Ti target is 3 inch with fixed discharge power of 400W. Magnetron sputtering plasma has been produced in high purity 99.99% Argon (Ar) and 99.99% Oxygen (O 2 ) environment pressure ranging from 5 to 20 mTorr. The TiO2 were growth on silicon and glass substrates. Substrate temperature during deposition was kept constant at 400°C. The distance between target and substrate holder was maintain at 14 cm with rotation of 10 rotation-per-minutes. Our X-ray diffraction result, shows anatase crystalline successfully formed with characterization peaks of plane (101) at 2θ = 25.28°, plane (202) at 2θ = 48.05° and plane (211) at 2θ = 55.06°. In addition, it is our interest to study the plasma properties and optical spectrum of Ti, Ti+ , O- , ArM and Ar+ in the chamber during the deposition process. Result of emission line intensities, electron density and temperature from optical spectroscope and Langmuir probe will be discuss further during the workshop. This works were supported by Graduate Incentive Scheme of Universiti Tun Hussein Onn Malaysia (UTHM) and Fundamental Research Grant Scheme of Ministry of Higher Education, Malaysia. (author)

  20. Compositionally graded SiCu thin film anode by magnetron sputtering for lithium ion battery

    Energy Technology Data Exchange (ETDEWEB)

    Polat, B.D., E-mail: bpolat@itu.edu.tr [Department of Metallurgical and Materials Engineering, Istanbul Technical University, Maslak, Istanbul 34469 (Turkey); Eryilmaz, O.L. [Energy Systems Division, Argonne National Laboratory, Argonne, IL 60439 (United States); Keleş, O., E-mail: ozgulkeles@itu.edu.tr [Department of Metallurgical and Materials Engineering, Istanbul Technical University, Maslak, Istanbul 34469 (Turkey); Erdemir, A. [Energy Systems Division, Argonne National Laboratory, Argonne, IL 60439 (United States); Amine, K. [Chemical Sciences and Engineering Division, Argonne National Laboratory, Argonne, IL 60439 (United States)

    2015-12-01

    Compositionally graded and non-graded composite SiCu thin films were deposited by magnetron sputtering technique on Cu disks for investigation of their potentials in lithium ion battery applications. The compositionally graded thin film electrodes with 30 at.% Cu delivered a 1400 mAh g{sup −1} capacity with 80% Coulombic efficiency in the first cycle and still retained its capacity at around 600 mAh g{sup −1} (with 99.9% Coulombic efficiency) even after 100 cycles. On the other hand, the non-graded thin film electrodes with 30 at.% Cu exhibited 1100 mAh g{sup −1} as the first discharge capacity with 78% Coulombic efficiency but the cycle life of this film degraded very quickly, delivering only 250 mAh g{sup −1} capacity after 100th cycles. Not only the Cu content but also the graded film thickness were believed to be the main contributors to the much superior performance of the compositionally graded SiCu films. We also believe that the Cu-rich region of the graded film helped reduce internal stress build-up and thus prevented film delamination during cycling. In particular, the decrease of Cu content from interface region to the top of the coating reduced the possibility of stress build-up across the film during cycling, thus leading to a high electrochemical performance.b - Highlights: • Highly adherent SiCu films are deposited by magnetron sputtering. • Compositionally graded SiCu film is produced and characterized. • Decrease of Cu content diverted the propagation of stress in the anode. • Cu rich layer at the bottom improves the adherence of the film.

  1. Investigation and optimization of the magnetic field configuration in high-power impulse magnetron sputtering

    International Nuclear Information System (INIS)

    Yu, He; Meng, Liang; Szott, Matthew M; Meister, Jack T; Cho, Tae S; Ruzic, David N

    2013-01-01

    An effort to optimize the magnetic field configuration specifically for high-power impulse magnetron sputtering (HiPIMS) was made. Magnetic field configurations with different field strengths, race track widths and race track patterns were designed using COMSOL. Their influence on HiPIMS plasma properties was investigated using a 36 cm diameter copper target. The I–V discharge characteristics were measured. The temporal evolution of electron temperature (T e ) and density (n e ) was studied employing a triple Langmuir probe, which was also scanned in the whole discharge region to characterize the plasma distribution and transport. Based on the studies, a closed path for electrons to drift along was still essential in HiPIMS in order to efficiently confine electrons and achieve a high pulse current. Very dense plasmas (10 19 –10 20 m −3 ) were generated in front of the race tracks during the pulse, and expanded downstream afterwards. As the magnetic field strength increased from 200 to 800 G, the expansion became faster and less isotropic, i.e. more directional toward the substrate. The electric potential distribution accounted for these effects. Varied race track widths and patterns altered the plasma distribution from the target to the substrate. A spiral-shaped magnetic field design was able to produce superior plasma uniformity on the substrate in addition to improved target utilization. (paper)

  2. Properties of planar structures based on Policluster films of diamond and AlN

    Science.gov (United States)

    Belyanin, A. F.; Luchnikov, A. P.; Nalimov, S. A.; Bagdasarian, A. S.

    2018-01-01

    AlN films doped with zinc were grown on Si substrates by RF magnetron reactive sputtering of a compound target. Policluster films of diamond doped with boron were formed on layered Si/AlN substrates from the gas phase hydrogen and methane, activated arc discharge. By electron microscopy, X-ray diffraction and Raman spectroscopy the composition and structure of synthetic policluster films of diamond and AlN films were studied. Photovoltaic devices based on the AlN/PFD layered structure are presented.

  3. Phase and Frequency Locked Magnetrons for SRF Sources

    Energy Technology Data Exchange (ETDEWEB)

    Neubauer, Michael [Muons, Inc.; Johnson, Rolland

    2014-09-12

    There is great potential for a magnetron power source that can be controlled both in phase and frequency. Such a power source could revolutionize many particle accelerator systems that require lower capital cost and/or higher power efficiency. Beyond the accelerator community, phase and frequency locked magnetons could improve radar systems around the world and make affordable phased arrays for wireless power transmission for solar powered satellites. This joint project of Muons, Inc., Fermilab, and L-3 CTL was supported by an STTR grant monitored by the Nuclear Physics Office of the DOE Office of Science. The object of the program was to incorporate ferrite materials into the anode of a magnetron and, with appropriate biasing of the ferrites, to maintain frequency lock and to allow for frequency adjustment of the magnetron without mechanical tuners. If successful, this device would have a dual use both as a source for SRF linacs and for military applications where fast tuning of the frequency is a requirement. In order to place the materials in the proper location, several attributes needed to be modeled. First the impact of the magnetron’s magnetic field needed to be shielded from the ferrites so that they were not saturated. And second, the magnetic field required to change the frequency of the magnetron at the ferrites needed to be shielded from the region containing the circulating electrons. ANSYS calculations of the magnetic field were used to optimize both of these parameters. Once the design for these elements was concluded, parts were fabricated and a complete test assembly built to confirm the predictions of the computer models. The ferrite material was also tested to determine its compatibility with magnetron tube processing temperatures. This required a vacuum bake out of the chosen material to determine the cleanliness of the material in terms of outgassing characteristics, and a subsequent room temperature test to verify that the characteristics of

  4. Angioplasty and stent - heart - discharge

    Science.gov (United States)

    Drug-eluting stents - discharge; PCI - discharge; Percutaneous coronary intervention - discharge; Balloon angioplasty - discharge; Coronary angioplasty - discharge; Coronary artery angioplasty - discharge; Cardiac ...

  5. Radiological discharges

    International Nuclear Information System (INIS)

    Woodliffe, J.

    1990-01-01

    Current practice of North Sea States on the discharge and disposal of liquid radioactive wastes to the North Sea are based on the declaration issued at the Second International Conference on the Protection of the North Sea, known as the London Declaration. This has three main points the first of which emphasises the application of the Best Available Technology to protect the North Sea, the second provides a framework on which future controls on radioactive discharges should be based. The third identifies two parts of the framework; to take into account the recommendations of international organizations and that any repositories of radioactive waste which are built should not pollute the North Sea. This chapter looks at how the concensus based on the London Declaration is working, gauges the progress made in the implementation of the policy goal, identifies existing and future areas for concern and proposes ways of strengthening the control of radioactive discharges. The emphasis is on the United Kingdom practice and regulations for liquid wastes, most of which comes from the Sellafield Reprocessing Plant. (author)

  6. Hydrogen discharges operating at atmospheric pressure in a semiconductor gas discharge system

    Energy Technology Data Exchange (ETDEWEB)

    Aktas, K; Acar, S; Salamov, B G [Physics Department, Faculty of Arts and Sciences, Gazi University, 06500 Ankara (Turkey)

    2011-08-15

    Analyses of physical processes which initiate electrical breakdown and spatial stabilization of current and control it with a photosensitive cathode in a semiconductor gas discharge system (SGDS) are carried out in a wide pressure range up to atmospheric pressure p, interelectrode distance d and diameter D of the electrode areas of the semiconductor cathode. The study compares the breakdown and stability curves of the gas discharge in the planar SGDS where the discharge gap is filled with hydrogen and air in two cases. The impact of the ionizing component of the discharge plasma on the control of the stable operation of the planar SGDS is also investigated at atmospheric pressure. The loss of stability is primarily due to modification of the semiconductor-cathode properties on the interaction with low-energy hydrogen ions and the formation of a space charge of positive ions in the discharge gap which changes the discharge from Townsend to glow type. The experimental results show that the discharge current in H{sub 2} is more stable than in air. The breakdown voltages are measured for H{sub 2} and air with parallel-plane electrodes, for pressures between 28 and 760 Torr. The effective secondary electron emission (SEE) coefficient is then determined from the breakdown voltage results and compared with the experimental results. The influence of the SEE coefficient is stated in terms of the differences between the experimental breakdown law.

  7. Corrosion of thin, magnetron sputtered Nb_2O_5 films

    International Nuclear Information System (INIS)

    Pillis, Marina Fuser; Geribola, Guilherme Altomari; Scheidt, Guilherme; Gonçalves de Araújo, Edval; Lopes de Oliveira, Mara Cristina; Antunes, Renato Altobelli

    2016-01-01

    Highlights: • Niobium oxide based films were obtained by DC magnetron sputtering. • Different deposition times were tested. • The best corrosion resistance was obtained for the Nb_2O_5 film produced at 15′. • Film porosity determines the corrosion resistance. - Abstract: Niobium oxide based thin films were deposited on AISI 316 stainless steel substrates using reactive DC magnetron sputtering. Structure, composition and corrosion resistance of the niobium oxide films were studied. The corrosion behavior of the specimens was evaluated by electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization. The concentration of niobium and oxygen in the films was obtained by Rutherford backscattering spectroscopy (RBS). The film structure was analyzed by X-ray diffractometry. The corrosion resistance of the substrate was improved by the Nb_2O_5 layers. The best protective performance was achieved for the deposition time of 15 min.

  8. Dynamic study of dual high-power impulse magnetron sputtering discharge by optical emission imaging

    Czech Academy of Sciences Publication Activity Database

    Straňák, V.; Bogdanowicz, R.; Drache, S.; Čada, Martin; Hubička, Zdeněk; Hippler, R.

    2011-01-01

    Roč. 39, č. 11 (2011), 2454-2455 ISSN 0093-3813 R&D Projects: GA AV ČR KAN301370701; GA ČR GP202/09/P159; GA ČR GA202/09/0800 Grant - others:AVČR(CZ) M100100915 Institutional research plan: CEZ:AV0Z10100522 Keywords : magnetic confinement * plasma properties * plasma sources Subject RIV: BH - Optics, Masers, Lasers Impact factor: 1.174, year: 2011

  9. Magnetron based high energy S-band linac system

    International Nuclear Information System (INIS)

    Tiwari, T.; Krishnan, R.; Phatangare, Manoj

    2012-01-01

    This paper deals with the study of magnetron based high energy S-band linear accelerator (linac) system operating at spot frequency 2.998 GHz. The energy and dose are two important parameters of linac system which depend on input power of microwave source and length of linac tube. Here the author has studied how these parameters can be improved for side coupled standing wave S-band linac system

  10. Magnetron co-sputtering system for coating ICF targets

    International Nuclear Information System (INIS)

    Hsieh, E.J.; Meyer, S.F.; Halsey, W.G.; Jameson, G.T.; Wittmayer, F.J.

    1981-01-01

    Fabrication of Inertial Confinement Fusion (ICF) targets requires deposition of various types of coatings on microspheres. The mechanical strength, and surface finish of the coatings are of concern in ICF experiments. The tensile strength of coatings can be controlled through grain refinement, selective doping and alloy formation. We have constructed a magnetron co-sputtering system to produce variable density profile coatings with high tensile strength on microspheres

  11. Special traits of the millimeter wave relativistic magnetron

    International Nuclear Information System (INIS)

    Berdin, S.A.; Chizhov, K.V.; Gadetski, N.P.; Korenev, V.G.; Lebedenko, A.N.; Marchenko, M.I.; Magda, I.I.; Melezhik, O.G.; Sinitsin, V.G.; Soshenko, V.A.

    2014-01-01

    A 8 mm band relativistic magnetron is investigated experimentally and by means of numerical simulation. The physical effects are analyzed which influence negatively the r.f. generation. The processes capable of reducing effectiveness of the generation and duration of the generated pulse include forward and backward axial flows of electrons, and intense electric fields - the generated microwaves and the fields owing to the space charge

  12. Methods of Phase and Power Control in Magnetron Transmitters for Superconducting Accelerators

    Energy Technology Data Exchange (ETDEWEB)

    Kazadevich, G. [MUONS Inc., Batavia; Johnson, R. [MUONS Inc., Batavia; Neubauer, M. [MUONS Inc., Batavia; Lebedev, V. [Fermilab; Schappert, W. [Fermilab; Yakovlev, V. [Fermilab

    2017-05-01

    Various methods of phase and power control in magnetron RF sources of superconducting accelerators intended for ADS-class projects were recently developed and studied with conventional 2.45 GHz, 1 kW, CW magnetrons operating in pulsed and CW regimes. Magnetron transmitters excited by a resonant (injection-locking) phasemodulated signal can provide phase and power control with the rates required for precise stabilization of phase and amplitude of the accelerating field in Superconducting RF (SRF) cavities of the intensity-frontier accelerators. An innovative technique that can significantly increase the magnetron transmitter efficiency at the widerange power control required for superconducting accelerators was developed and verified with the 2.45 GHz magnetrons operating in CW and pulsed regimes. High efficiency magnetron transmitters of this type can significantly reduce the capital and operation costs of the ADSclass accelerator projects.

  13. Planar channeling in superlattices: Theory

    International Nuclear Information System (INIS)

    Ellison, J.A.; Picraux, S.T.; Allen, W.R.; Chu, W.K.

    1988-01-01

    The well-known continuum model theory for planar channeled energetic particles in perfect crystals is extended to layered crystalline structures and applied to superlattices. In a strained-layer structure, the planar channels with normals which are not perpendicular to the growth direction change their direction at each interface, and this dramatically influences the channeling behavior. The governing equation of motion for a planar channeled ion in a strained-layer superlattice with equal layer thicknesses is a one degree of freedom nonlinear oscillator which is periodically forced with a sequence of δ functions. These δ functions, which are of equal spacing and amplitude with alternating sign, represent the tilts at each of the interfaces. Thus upon matching an effective channeled particle wavelength, corresponding to a natural period of the nonlinear oscillator, to the period of the strained-layer superlattice, corresponding to the periodic forcing, strong resonance effects are expected. The condition of one effective wavelength per period corresponds to a rapid dechanneling at a well-defined depth (catastrophic dechanneling), whereas two wavelengths per period corresponds to no enhanced dechanneling after the first one or two layers (resonance channeling). A phase plane analysis is used to characterize the channeled particle motion. Detailed calculations using the Moliere continuum potential are compared with our previously described modified harmonic model, and new results are presented for the phase plane evolution, as well as the dechanneling as a function of depth, incident angle, energy, and layer thickness. General scaling laws are developed and nearly universal curves are obtained for the dechanneling versus depth under catastrophic dechanneling

  14. Ultrathin two-dimensional MnO2/graphene hybrid nanostructures for high-performance, flexible planar supercapacitors.

    Science.gov (United States)

    Peng, Lele; Peng, Xu; Liu, Borui; Wu, Changzheng; Xie, Yi; Yu, Guihua

    2013-05-08

    Planar supercapacitors have recently attracted much attention owing to their unique and advantageous design for 2D nanomaterials based energy storage devices. However, improving the electrochemical performance of planar supercapacitors still remains a great challenge. Here we report for the first time a novel, high-performance in-plane supercapacitor based on hybrid nanostructures of quasi-2D ultrathin MnO2/graphene nanosheets. Specifically, the planar structures based on the δ-MnO2 nanosheets integrated on graphene sheets not only introduce more electrochemically active surfaces for absorption/desorption of electrolyte ions, but also bring additional interfaces at the hybridized interlayer areas to facilitate charge transport during charging/discharging processes. The unique structural design for planar supercapacitors enables great performance enhancements compared to graphene-only devices, exhibiting high specific capacitances of 267 F/g at current density of 0.2 A/g and 208 F/g at 10 A/g and excellent rate capability and cycling stability with capacitance retention of 92% after 7000 charge/discharge cycles. Moreover, the high planar malleability of planar supercapacitors makes possible superior flexibility and robust cyclability, yielding capacitance retention over 90% after 1000 times of folding/unfolding. Ultrathin 2D nanomaterials represent a promising material platform to realize highly flexible planar energy storage devices as the power back-ups for stretchable/flexible electronic devices.

  15. Hysterectomy - vaginal - discharge

    Science.gov (United States)

    Vaginal hysterectomy - discharge; Laparoscopically assisted vaginal hysterectomy - discharge; LAVH - discharge ... you were in the hospital, you had a vaginal hysterectomy. Your surgeon made a cut in your ...

  16. Non-planar ABJ theory and parity

    International Nuclear Information System (INIS)

    Caputa, Pawel; Kristjansen, Charlotte; Zoubos, Konstantinos

    2009-01-01

    While the ABJ Chern-Simons-matter theory and its string theory dual manifestly lack parity invariance, no sign of parity violation has so far been observed on the weak coupling spin chain side. In particular, the planar two-loop dilatation generator of ABJ theory is parity invariant. In this Letter we derive the non-planar part of the two-loop dilatation generator of ABJ theory in its SU(2)xSU(2) sub-sector. Applying the dilatation generator to short operators, we explicitly demonstrate that, for operators carrying excitations on both spin chains, the non-planar part breaks parity invariance. For operators with only one type of excitation, however, parity remains conserved at the non-planar level. We furthermore observe that, as for ABJM theory, the degeneracy between planar parity pairs is lifted when non-planar corrections are taken into account.

  17. Modeling the planar configuration of extraordinary magnetoresistance

    International Nuclear Information System (INIS)

    El-Ahmar, S; Pozniak, A A

    2015-01-01

    Recently the planar version of the extraordinary magnetoresistance (EMR) magnetic field sensor has been constructed and verified in practice. Planar configuration of the EMR device gives many technological advantages, it is simpler than the classic and allows one to build the sensor using electric materials of the new type (such as graphene or topological insulators) much easier. In this work the planar configuration of the EMR sensor is investigated by performing computational simulations using the finite element method (FEM). The computational comparison of the planar and classic configurations of EMR is presented using three-dimensional models. Various variants of the geometry of EMR sensor components are pondered and compared in the planar and classic version. Size of the metal overlap is considered for sensor optimization as well as various semiconductor-metal contact resistance dependences of the EMR signal. Based on computational simulations, a method for optimal placement of electric terminals in a planar EMR device is proposed. (paper)

  18. Non-planar ABJ Theory and Parity

    DEFF Research Database (Denmark)

    Caputa, Pawel; Kristjansen, Charlotte; Zoubos, Konstantinos

    2009-01-01

    we derive the non-planar part of the two-loop dilatation generator of ABJ theory in its SU(2)xSU(2) sub-sector. Applying the dilatation generator to short operators, we explicitly demonstrate that, for operators carrying excitations on both spin chains, the non-planar part breaks parity invariance......While the ABJ Chern-Simons-matter theory and its string theory dual manifestly lack parity invariance, no sign of parity violation has so far been observed on the weak coupling spin chain side. In particular, the planar two-loop dilatation generator of ABJ theory is parity invariant. In this letter....... For operators with only one type of excitation, however, parity remains conserved at the non-planar level. We furthermore observe that, as for ABJM theory, the degeneracy between planar parity pairs is lifted when non-planar corrections are taken into account....

  19. Magnetron with smooth anode. Statistical theory and ordered oscillations; Magnetron a anode lisse. Theorie statistique et oscillations ordonnees

    Energy Technology Data Exchange (ETDEWEB)

    Coste, J.

    1961-03-15

    We have to investigate the equilibrium regime that appears between a hot cathode and the electronic cloud that is confined around the cathode by a magnetic field parallel to its axis. The densities being high enough to involve the effect of space charge. The challenge of the magnetron theory is to face 2 issues: first the structure of the electronic cloud in a diode submitted to a magnetic field and secondly the oscillations that are likely to appear in this cloud. In this work we have made 2 attempts to clarify the situation, we have extended the classical theory of the static charge of space through a study of its oscillation modes on one hand and on the other hand we have tackled the issue of the structure of the electronic cloud with the tool of statistics. This document is divided into 2 chapters. In the first chapter we present a static study of the magnetron in which we take a statistical approach deliberately. We give answers to the issue of the thermodynamical equilibrium of the electronic cloud and we have found a mode very close to the Brillouin mode. The statistical approach has made us discuss the boundary conditions on the cathode, it means the coupling between the cathode and the electronic cloud. In the second chapter we present the theoretical study of the oscillations in a magnetron operating in the Brillouin mode. The resonances that appear in experimental data stay difficult to explain.

  20. Characterization of sp3 bond content of carbon films deposited by high power gas injection magnetron sputtering method by UV and VIS Raman spectroscopy

    Science.gov (United States)

    Zdunek, Krzysztof; Chodun, Rafał; Wicher, Bartosz; Nowakowska-Langier, Katarzyna; Okrasa, Sebastian

    2018-04-01

    This paper presents the results of investigations of carbon films deposited by a modified version of the magnetron sputtering method - HiPGIMS (High Power Gas Injection Magnetron Sputtering). In this experiment, the magnetron system with inversely polarized electrodes (sputtered cathode at ground potential and positively biased, spatially separated anode) was used. This arrangement allowed us to conduct the experiment using voltages ranging from 1 to 2 kV and a power supply system equipped with 25/50 μF capacitor battery. Carbon films were investigated by VIS/UV Raman spectroscopy. Sp3/sp2 bonding ratio was evaluated basing the elementary components of registered spectra. Our investigation showed that sp3 bond content increases with discharge power but up to specific value only. In extreme conditions of generating plasma impulses, we detected a reversed relation of the sp3/sp2 ratio. In our opinion, a energy of plasma pulse favors nucleation of a sp3 phase because of a relatively higher ionization state but in extreme cases the influence of energy is reversed.

  1. Characterization of sp3 bond content of carbon films deposited by high power gas injection magnetron sputtering method by UV and VIS Raman spectroscopy.

    Science.gov (United States)

    Zdunek, Krzysztof; Chodun, Rafał; Wicher, Bartosz; Nowakowska-Langier, Katarzyna; Okrasa, Sebastian

    2018-04-05

    This paper presents the results of investigations of carbon films deposited by a modified version of the magnetron sputtering method - HiPGIMS (High Power Gas Injection Magnetron Sputtering). In this experiment, the magnetron system with inversely polarized electrodes (sputtered cathode at ground potential and positively biased, spatially separated anode) was used. This arrangement allowed us to conduct the experiment using voltages ranging from 1 to 2kV and a power supply system equipped with 25/50μF capacitor battery. Carbon films were investigated by VIS/UV Raman spectroscopy. Sp 3 /sp 2 bonding ratio was evaluated basing the elementary components of registered spectra. Our investigation showed that sp 3 bond content increases with discharge power but up to specific value only. In extreme conditions of generating plasma impulses, we detected a reversed relation of the sp 3 /sp 2 ratio. In our opinion, a energy of plasma pulse favors nucleation of a sp 3 phase because of a relatively higher ionization state but in extreme cases the influence of energy is reversed. Copyright © 2018 Elsevier B.V. All rights reserved.

  2. Lung surgery - discharge

    Science.gov (United States)

    ... Lung biopsy - discharge; Thoracoscopy - discharge; Video-assisted thoracoscopic surgery - discharge; VATS - discharge ... milk) for 2 weeks after video-assisted thoracoscopic surgery and 6 to 8 weeks after open surgery. ...

  3. Pediatric heart surgery - discharge

    Science.gov (United States)

    ... discharge; Heart valve surgery - children - discharge; Heart surgery - pediatric - discharge; Heart transplant - pediatric - discharge ... Geme JW, Schor NF, eds. Nelson Textbook of Pediatrics . 20th ed. Philadelphia, PA: Elsevier; 2016:chap 434. ...

  4. The radiofrequency magnetic dipole discharge

    Energy Technology Data Exchange (ETDEWEB)

    Martines, E., E-mail: emilio.martines@igi.cnr.it; Zuin, M.; Cavazzana, R.; Fassina, A.; Spolaore, M. [Consorzio RFX (CNR, ENEA, INFN, Università di Padova, Acciaierie Venete SpA), Corso Stati Uniti 4, 35127 Padova (Italy); Marcante, M. [Dipartimento di Fisica, Università di Trento, via Sommarive 14, 38123 Povo, TN (Italy); TIFPA, Trento Institute for Fundamental Physics and Applications INFN, 38123 Trento (Italy)

    2016-05-15

    This paper describes a novel and simple concept of plasma source, which is able to produce a radiofrequency magnetized discharge with minimal power requirements. The source is based on the magnetron concept and uses a permanent magnet as an active electrode. The dipolar field produced by the magnet confines the electrons, which cause further ionization, thus producing a toroidally shaped plasma in the equatorial region around the electrode. A plasma can be ignited with such scheme with power levels as low as 5 W. Paschen curves have been built for four different working gases, showing that in Helium or Neon, plasma breakdown is easily obtained also at atmospheric pressure. The plasma properties have been measured using a balanced Langmuir probe, showing that the electron temperature is around 3–4 eV and higher in the cathode proximity. Plasma densities of the order of 10{sup 16 }m{sup −3} have been obtained, with a good positive scaling with applied power. Overall, the electron pressure appears to be strongly correlated with the magnetic field magnitude in the measurement point.

  5. The radiofrequency magnetic dipole discharge

    Science.gov (United States)

    Martines, E.; Zuin, M.; Marcante, M.; Cavazzana, R.; Fassina, A.; Spolaore, M.

    2016-05-01

    This paper describes a novel and simple concept of plasma source, which is able to produce a radiofrequency magnetized discharge with minimal power requirements. The source is based on the magnetron concept and uses a permanent magnet as an active electrode. The dipolar field produced by the magnet confines the electrons, which cause further ionization, thus producing a toroidally shaped plasma in the equatorial region around the electrode. A plasma can be ignited with such scheme with power levels as low as 5 W. Paschen curves have been built for four different working gases, showing that in Helium or Neon, plasma breakdown is easily obtained also at atmospheric pressure. The plasma properties have been measured using a balanced Langmuir probe, showing that the electron temperature is around 3-4 eV and higher in the cathode proximity. Plasma densities of the order of 1016 m-3 have been obtained, with a good positive scaling with applied power. Overall, the electron pressure appears to be strongly correlated with the magnetic field magnitude in the measurement point.

  6. Comparative study of total power density at a substrate in pulsed DC magnetron and hollow-cathode plasma jet sputtering systems

    Czech Academy of Sciences Publication Activity Database

    Čada, Martin; Virostko, Petr; Kment, Štěpán; Hubička, Zdeněk

    2009-01-01

    Roč. 6, S1 (2009), S247-S252 ISSN 1612-8850. [International Conference on Plasma Surface Engineering /11./. Garmisch Partenkirchen, 15.09.2008-19.09.2008] R&D Projects: GA AV ČR KAN301370701; GA AV ČR KJB100100707; GA AV ČR KJB100100805; GA MŠk(CZ) 1M06002 Institutional research plan: CEZ:AV0Z10100522 Keywords : calorimeter probe * floating substrate * magnetron * plasma jet * pulsed discharge Subject RIV: BH - Optics, Masers, Lasers Impact factor: 4.037, year: 2009

  7. Geodesic distance in planar graphs

    International Nuclear Information System (INIS)

    Bouttier, J.; Di Francesco, P.; Guitter, E.

    2003-01-01

    We derive the exact generating function for planar maps (genus zero fatgraphs) with vertices of arbitrary even valence and with two marked points at a fixed geodesic distance. This is done in a purely combinatorial way based on a bijection with decorated trees, leading to a recursion relation on the geodesic distance. The latter is solved exactly in terms of discrete soliton-like expressions, suggesting an underlying integrable structure. We extract from this solution the fractal dimensions at the various (multi)-critical points, as well as the precise scaling forms of the continuum two-point functions and the probability distributions for the geodesic distance in (multi)-critical random surfaces. The two-point functions are shown to obey differential equations involving the residues of the KdV hierarchy

  8. Planar Hall effect bridge magnetic field sensors

    DEFF Research Database (Denmark)

    Henriksen, A.D.; Dalslet, Bjarke Thomas; Skieller, D.H.

    2010-01-01

    Until now, the planar Hall effect has been studied in samples with cross-shaped Hall geometry. We demonstrate theoretically and experimentally that the planar Hall effect can be observed for an exchange-biased ferromagnetic material in a Wheatstone bridge topology and that the sensor signal can...... Hall effect bridge sensors....

  9. Attractive planar panelization using dynamic relaxation principles

    NARCIS (Netherlands)

    Gauss, Florian; Teuffel, Patrick

    2015-01-01

    In the presented paper a new method is proposed to approximate a given NURBS surface with a PQ (Planar Quad) mesh. The desired mesh layout will be generated in then attracted to the target surface. The process iteratively pulls the mesh vertices towards the target surface and then planarizes the

  10. Orientifold Planar Equivalence: The Chiral Condensate

    DEFF Research Database (Denmark)

    Armoni, Adi; Lucini, Biagio; Patella, Agostino

    2008-01-01

    The recently introduced orientifold planar equivalence is a promising tool for solving non-perturbative problems in QCD. One of the predictions of orientifold planar equivalence is that the chiral condensates of a theory with $N_f$ flavours of Dirac fermions in the symmetric (or antisymmetric...

  11. Planar Algebra of the Subgroup-Subfactor

    Indian Academy of Sciences (India)

    The crucial step in this identification is an exhibition of a model for the basic construction tower, and thereafter of the standard invariant of R ⋊ H ⊂ R ⋊ G in terms of operator matrices. We also obtain an identification between the planar algebra of the fixed algebra subfactor R G ⊂ R H and the -invariant planar subalgebra ...

  12. Piecewise planar Möbius bands

    DEFF Research Database (Denmark)

    Gravesen, Jens

    2005-01-01

    t is shown that a closed polygon with an odd number of vertices is the median of exactly one piecewise planar cylinder and one piecewise planar Möbius band, intersecting each other orthogonally. A closed polygon with an even number of vertices is in the generic case neither the median...

  13. The Planar Sandwich and Other 1D Planar Heat Flow Test Problems in ExactPack

    Energy Technology Data Exchange (ETDEWEB)

    Singleton, Jr., Robert [Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

    2017-01-24

    This report documents the implementation of several related 1D heat flow problems in the verification package ExactPack [1]. In particular, the planar sandwich class defined in Ref. [2], as well as the classes PlanarSandwichHot, PlanarSandwichHalf, and other generalizations of the planar sandwich problem, are defined and documented here. A rather general treatment of 1D heat flow is presented, whose main results have been implemented in the class Rod1D. All planar sandwich classes are derived from the parent class Rod1D.

  14. Reactive magnetron sputtering model at making Ti-TiOx coatings

    International Nuclear Information System (INIS)

    Luchkin, A G; Kashapov, N F

    2014-01-01

    Mathematical model of reactive magnetron sputtering for plant VU 700-D is described. Approximating curves for experimental current-voltage characteristic for two gas input schemas are shown. Choice of gas input schema influences on model parameters (mainly on pumping speed). Reactive magnetron sputtering model allows develop technology of Ti - TiO x coatings deposition without changing atmosphere and pressure in vacuum chamber

  15. Variability in DMSA reporting following urinary tract infection in children: pinhole, planar, and pinhole with planar

    International Nuclear Information System (INIS)

    Rossleigh, M.A.; Christian, C.L.; Craig, J.C.; Howman-Giles, R.B.; Grunewald, S.

    2004-01-01

    Purpose: To determine whether the provision of DMSA images obtained by pinhole collimation reduces inter-observer variability of reporting compared with planar DMSA images alone. Methods: One hundred consecutive DMSA images were independently interpreted three times (pinhole alone, planar alone, pinhole and planar) by four participating nuclear medicine specialists from different departments and in random order. The presence or absence of renal parenchymal abnormality was classified using the modified four level grading system of Goldraich with mean values for the 6 comparisons reported. Results: The proportion of DMSA images interpreted as abnormal was 31% for planar, 34% for pinhole and 33% for planar with pinhole. Agreement was 89% for planar alone, 89% for pinhole alone and 90% for planar with pinhole, with kappa values 0.74, 0.75 and 0.80 respectively for the normal-abnormal scan classification of individual children. These results did not vary appreciably whether interpretation of patients, kidneys or kidney zones was compared. Reasons for disagreement in reporting included different interpretations of 'abnormalities' as normal anatomical variations (splenic impression, fetal lobulation, duplex collecting systems, column of Bertin) or true parenchymal abnormalities, different adjustments in thresholds for reporting abnormality when images were technically suboptimal, different weighting given to pinhole and planar images when both were provided, and error. Conclusion: Four experienced nuclear medicine physicians showed substantial agreement in the interpretation of planar alone, pinhole alone and planar with pinhole DMSA images, but the provision of both sets of images, planar and pinhole, did not reduce variability. (authors)

  16. Aluminum oxide films deposited in low pressure conditions by reactive pulsed dc magnetron sputtering

    CERN Document Server

    Seino, T

    2002-01-01

    The reactive pulsed dc sputtering technique is widely used for the deposition of oxide films. The operating pressure for sputtering is commonly above 0.13 Pa. In this study, however, aluminum oxide (alumina) films were deposited at operating pressures from 0.06 to 0.4 Pa using a sputtering system equipped with a scanning magnetron cathode and a pulsed dc power supply. The pulsed dc power was found to be useful not only to reduce arcing, but also to sustain the discharge at low pressure. The electrical breakdown field, intrinsic stress, O/Al ratio, refractive index, and surface roughness were investigated. Both a low intrinsic stress and an O/Al ratio around the stoichiometry were required to get the film having a high breakdown field. A low operating pressure of 0.1 Pa was found to provide the necessary stress and O/Al ratio targets. A 50-nm-thick alumina film having a maximum breakdown field of 7.4 MV/cm was obtained.

  17. Time resolved 2-D optical imaging of a pulsed unbalanced magnetron plasma

    International Nuclear Information System (INIS)

    Bradley, J W; Clarke, G C B; Braithwaite, N St J; Bryant, P M; Kelly, P J

    2006-01-01

    Using wavelength filtered two dimensional (2-D) optical imaging, the temporal and spatial evolution of selected excited species in a pulsed magnetron discharge has been studied. A titanium target was sputtered at a pulse frequency of 100 kHz, in an argon atmosphere, at an operating pressure of 0.27 Pa. The radial information of the emissivity was determined using the Abel inversion technique. The results show strong excitation of the observed species above the racetrack in the on-time, and the possible development of an ion-acoustic wave, initiated after the off-on transition. The on-off transition is accompanied by a burst of light from the plasma bulk consistent with the transient plasma potential reaching about +200 V. During this phase, we argue that there is a release of secondary electrons from the grounded substrate and walls due to ion bombardment, as well as an increased confinement of energetic plasma electrons. The characteristic decay times of the selected transitions at 750.4, 751.5, 810.4 and 811.5 nm (ArI), present within the bandpass width of our filters, is briefly discussed in terms of the production of fast electrons in the system

  18. Adhesion analysis for chromium nitride thin films deposited by reactive magnetron sputtering

    Science.gov (United States)

    Rusu, F. M.; Merie, V. V.; Pintea, I. M.; Molea, A.

    2016-08-01

    The thin film industry is continuously growing due to the wide range of applications that require the fabrication of advanced components such as sensors, biological implants, micro-electromechanical devices, optical coatings and so on. The selection regarding the deposition materials, as well as the deposition technology influences the properties of the material and determines the suitability of devices for certain real-world applications. This paper is focused on the adhesion force for several chromium nitride thin films obtained by reactive magnetron sputtering. All chromium nitride thin films were deposited on a silicon substrate, the discharge current and the argon flow being kept constant. The main purpose of the paper is to determine the influence of deposition parameters on the adhesion force. Therefore some of the deposition parameters were varied in order to study their effect on the adhesion force. Experimentally, the values of the adhesion force were determined in multiple points for each sample using the spectroscopy in point mode of the atomic force microscope. The obtained values were used to estimate the surface energy of the CrN thin films based on two existing mathematical models for the adhesion force when considering the contact between two bodies.

  19. High power impulse magnetron sputtering and its applications

    Science.gov (United States)

    Yan, YUAN; Lizhen, YANG; Zhongwei, LIU; Qiang, CHEN

    2018-04-01

    High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process, which has been demonstrated to be advantageous for better quality coating. Therefore, the mechanism of the HiPIMS technique has recently been investigated. In this paper, the current knowledge of HiPIMS is described. We focus on the mechanical properties of the deposited thin film in the latest applications, including hard coatings, adhesion enhancement, tribological performance, and corrosion protection layers. A description of the electrical, optical, photocatalytic, and functional coating applications are presented. The prospects for HiPIMS are also discussed in this work.

  20. Heteroepitaxial Ge-on-Si by DC magnetron sputtering

    Directory of Open Access Journals (Sweden)

    Martin Steglich

    2013-07-01

    Full Text Available The growth of Ge on Si(100 by DC Magnetron Sputtering at various temperatures is studied by Spectroscopic Ellipsometry and Transmission Electron Microscopy. Smooth heteroepitaxial Ge films are prepared at relatively low temperatures of 380°C. Typical Stransky-Krastanov growth is observed at 410°C. At lower temperatures (320°C, films are essentially amorphous with isolated nanocrystallites at the Si-Ge interface. A minor oxygen contamination at the interface, developing after ex-situ oxide removal, is not seen to hinder epitaxy. Compensation of dislocation-induced acceptors in Ge by sputtering from n-doped targets is proposed.

  1. Pd-catalysts for DFAFC prepared by magnetron sputtering

    Czech Academy of Sciences Publication Activity Database

    Bieloshapka, Igor; Jiříček, Petr; Vorokhta, M.; Tomšík, Elena; Rednyk, A.; Perekrestov, R.; Jurek, Karel; Ukraintsev, Egor; Hruška, Karel; Romanyuk, Olexandr; Lesiak, B.

    2017-01-01

    Roč. 419, Oct (2017), s. 838-846 ISSN 0169-4332 R&D Projects: GA ČR(CZ) GBP108/12/G108; GA MŠk LM2015088 Institutional support: RVO:68378271 ; RVO:61389013 Keywords : Pd catalyst * formic acid fuel cell * magnetron sputtering * DFAFC * surface morphology Subject RIV: BM - Solid Matter Physics ; Magnetism; BM - Solid Matter Physics ; Magnetism (UMCH-V) OBOR OECD: Condensed matter physics (including formerly solid state physics, supercond.); Condensed matter physics (including formerly solid state physics, supercond.) (UMCH-V) Impact factor: 3.387, year: 2016

  2. Some properties of the gas magnetron; neke osobine gasnog magnetrona

    Energy Technology Data Exchange (ETDEWEB)

    Miljevic, V [Boris Kidric Institute of nuclear sciences, Vinca, Belgrade (Yugoslavia)

    1979-07-01

    The cylindrical magnetron diode with directly heated cathode, filled with argon at low pressure, has been studied. In the case of high magnetic fields and low gas pressure the motion of electrons is reduced to the rotation around the cathode with superimposed allow radial drift. It is found that the plasma formation time in in the msec region. The critical magnetic field in the vacuum diode (B{sub c}), and its value increases with the increase of the anode voltage and working pressure. (author)

  3. Phase Grouping of Larmor Electrons by a Synchronous Wave in Controlled Magnetrons

    Energy Technology Data Exchange (ETDEWEB)

    Kazakevich, G. [MUONS Inc., Batavia; Johnson, R. [MUONS Inc., Batavia; Lebedev, V. [Fermilab; Yakovlev, V. [Fermilab

    2018-04-01

    A simplified analytical model based on the charge drift approximation has been developed. It considers the resonant interaction of the synchronous wave with the flow of Larmor electrons in a magnetron. The model predicts stable coherent generation of the tube above and below the threshold of self-excitation. This occurs if the magnetron is driven by a sufficient resonant injected signal (up to -10 dB). The model substantiates precise stability, high efficiency and low noise at the range of the magnetron power control over 10 dB by variation of the magnetron current. The model and the verifying experiments with 2.45 GHz, 1 kW magnetrons are discussed.

  4. Numerical investigation of dielectric barrier discharges

    Science.gov (United States)

    Li, Jing

    1997-12-01

    A dielectric barrier discharge (DBD) is a transient discharge occurring between two electrodes in coaxial or planar arrangements separated by one or two layers of dielectric material. The charge accumulated on the dielectric barrier generates a field in a direction opposite to the applied field. The discharge is quenched before an arc is formed. It is one of the few non-thermal discharges that operates at atmospheric pressure and has the potential for use in pollution control. In this work, a numerical model of the dielectric barrier discharge is developed, along with the numerical approach. Adaptive grids based on the charge distribution is used. A self-consistent method is used to solve for the electric field and charge densities. The Successive Overrelaxation (SOR) method in a non-uniform grid spacing is used to solve the Poisson's equation in the cylindrically-symmetric coordinate. The Flux Corrected Transport (FCT) method is modified to solve the continuity equations in the non-uniform grid spacing. Parametric studies of dielectric barrier discharges are conducted. General characteristics of dielectric barrier discharges in both anode-directed and cathode-directed streamer are studied. Effects of the dielectric capacitance, the applied field, the resistance in external circuit and the type of gases (O2, air, N2) are investigated. We conclude that the SOR method in an adaptive grid spacing for the solution of the Poisson's equation in the cylindrically-symmetric coordinate is convergent and effective. The dielectric capacitance has little effect on the g-factor of radical production, but it determines the strength of the dielectric barrier discharge. The applied field and the type of gases used have a significant role on the current peak, current pulse duration and radical generation efficiency, discharge strength, and microstreamer radius, whereas the external series resistance has very little effect on the streamer properties. The results are helpful in

  5. High temperature superconducting films by rf magnetron sputtering

    International Nuclear Information System (INIS)

    Kadin, A.M.; Ballentine, P.H.

    1989-01-01

    The authors have produced sputtered films of Y-Ba-Cu-O and Bi-Sr-Ca-Cu-O by rf magnetron sputtering from an oxide target consisting of loose reacted powder. The use of a large 8-inch stoichiometric target in the magnetron mode permits films located above the central region to be free of negative-ion resputtering effects, and hence yields reproducible, uniform stoichiometric compositions for a wide range of substrate temperatures. Superconducting YBCO films have been obtained either by sputtering at low temperatures followed by an 850 0 C oxygen anneal, or alternatively by depositing onto substrates heated to ∼600 - 650 0 C and cooling in oxygen. Films prepared by the former method on cubic zirconia substrate consist of randomly oriented crystallites with zero resistance above 83 K. Those deposited on zirconia at medium temperatures without the high-temperature anneal contain smooth partially oriented crystallites, with a slightly depressed T/sub c/ ∼75K. Finally, superconducting films have been deposited on MgO using a BiSrCaCu/sub 2/O/sub x/ powder target

  6. Planar impact experiments for EOS measurements

    International Nuclear Information System (INIS)

    Furnish, M.D.

    1993-01-01

    The community concerned with the numerical modeling of groundshock produced by underground nuclear tests must have access to materials data to benchmark models of rock behavior. Historically the primary source of these data has been planar impact experiments. These experiments have involved gun, explosive and electrical launchers. Other methods of introducing planar shocks include shock driving by in-contact explosives or laser bursts. This paper briefly describes gun launcher-based planar impact methods used to characterize geological materials at Sandia National Laboratories

  7. Piezo Voltage Controlled Planar Hall Effect Devices.

    Science.gov (United States)

    Zhang, Bao; Meng, Kang-Kang; Yang, Mei-Yin; Edmonds, K W; Zhang, Hao; Cai, Kai-Ming; Sheng, Yu; Zhang, Nan; Ji, Yang; Zhao, Jian-Hua; Zheng, Hou-Zhi; Wang, Kai-You

    2016-06-22

    The electrical control of the magnetization switching in ferromagnets is highly desired for future spintronic applications. Here we report on hybrid piezoelectric (PZT)/ferromagnetic (Co2FeAl) devices in which the planar Hall voltage in the ferromagnetic layer is tuned solely by piezo voltages. The change of planar Hall voltage is associated with magnetization switching through 90° in the plane under piezo voltages. Room temperature magnetic NOT and NOR gates are demonstrated based on the piezo voltage controlled Co2FeAl planar Hall effect devices without the external magnetic field. Our demonstration may lead to the realization of both information storage and processing using ferromagnetic materials.

  8. Dynamic Planar Range Maxima Queries

    DEFF Research Database (Denmark)

    Brodal, Gerth Stølting; Tsakalidis, Konstantinos

    2011-01-01

    We consider the dynamic two-dimensional maxima query problem. Let P be a set of n points in the plane. A point is maximal if it is not dominated by any other point in P. We describe two data structures that support the reporting of the t maximal points that dominate a given query point, and allow...... for insertions and deletions of points in P. In the pointer machine model we present a linear space data structure with O(logn + t) worst case query time and O(logn) worst case update time. This is the first dynamic data structure for the planar maxima dominance query problem that achieves these bounds...... are integers in the range U = {0, …,2 w  − 1 }. We present a linear space data structure that supports 3-sided range maxima queries in O(logn/loglogn+t) worst case time and updates in O(logn/loglogn) worst case time. These are the first sublogarithmic worst case bounds for all operations in the RAM model....

  9. Tennis elbow surgery - discharge

    Science.gov (United States)

    ... epicondylitis surgery - discharge; Lateral tendinosis surgery - discharge; Lateral tennis elbow surgery - discharge ... long as you are told. This helps ensure tennis elbow will not return. You may be prescribed a ...

  10. Ankle replacement - discharge

    Science.gov (United States)

    ... total - discharge; Total ankle arthroplasty - discharge; Endoprosthetic ankle replacement - discharge; Osteoarthritis - ankle ... You had an ankle replacement. Your surgeon removed and reshaped ... an artificial ankle joint. You received pain medicine and were ...

  11. Hip fracture - discharge

    Science.gov (United States)

    ... neck fracture repair - discharge; Trochanteric fracture repair - discharge; Hip pinning surgery - discharge ... in the hospital for surgery to repair a hip fracture, a break in the upper part of ...

  12. Asthma - child - discharge

    Science.gov (United States)

    Pediatric asthma - discharge; Wheezing - discharge; Reactive airway disease - discharge ... Your child has asthma , which causes the airways of the lungs to swell and narrow. In the hospital, the doctors and nurses helped ...

  13. Influence of stress on the structural and dielectric properties of rf magnetron sputtered zinc oxide thin film

    Science.gov (United States)

    Menon, Rashmi; Sreenivas, K.; Gupta, Vinay

    2008-05-01

    Highly c axis oriented zinc oxide (ZnO) thin films have been prepared on 1737 Corning glass substrate by planar rf magnetron sputtering under varying pressure (10-50mTorr) and different oxygen percentage (40%-100%) in reactive gas mixtures. The as-grown ZnO thin films were found to have stress over a wide range from -6×1010to-9×107dynes/cm2. The presence of stress depends strongly on processing conditions, and films become almost stress free under a unique combination of sputtering pressure and reactive gas composition. The studies show a correlation of stress with structural and electrical properties of the ZnO thin film. The stressed films possess high electrical conductivity and exhibits strong dielectric dispersion over a wide frequency (1kHz-1MHz). The dielectric constant ɛ'(ω) of stress free ZnO film was almost frequency independent and was close to the bulk value. The measured value of dc conductivity, σdc(ω) and ac conductivity σac(ω) of stress free ZnO film was 1.3×10-9 and 6.8×10-5Ω-1cm-1, respectively. The observed variation in the structural and electrical properties of ZnO thin film with stress has been analyzed in the light of growth kinetics.

  14. Modified planar functions and their components

    DEFF Research Database (Denmark)

    Anbar Meidl, Nurdagül; Meidl, Wilfried Meidl

    2017-01-01

    functions in odd characteristic as a vectorial bent function. We finally point out that though these components behave somewhat different than the multivariate bent4 functions, they are bent or semibent functions shifted by a certain quadratic term, a property which they share with their multivariate......Zhou ([20]) introduced modified planar functions in order to describe (2n; 2n; 2n; 1) relative difference sets R as a graph of a function on the finite field F2n, and pointed out that projections of R are difference sets that can be described by negabent or bent4 functions, which are Boolean...... functions given in multivariate form. One of the objectives of this paper is to contribute to the understanding of these component functions of modified planar functions. Moreover, we obtain a description of modified planar functions by their components which is similar to that of the classical planar...

  15. Research and Development for an Alternative RF Source Using Magnetrons in CEBAF

    Science.gov (United States)

    Jacobs, Andrew

    2016-09-01

    At Jefferson Lab, klystrons are currently used as a radiofrequency (RF) power source for the 1497 MHz Continuous Electron Beam Accelerator Facility (CEBAF) Continuous Wave (CW) system. A drop-in replacement for the klystrons in the form of a system of magnetrons is being developed. The klystron DC-RF efficiency at CEBAF is 35-51% while the estimated magnetron efficiency is 80-90%. Thus, the introduction of magnetrons to CEBAF will have enormous benefits in terms of electrical power saving. The primary focus of this project was to characterize a magnetron's frequency pushing and pulling curves at 2.45 GHz with stub tuner and anode current adjustments so that a Low Level RF controller for a new 1.497 GHz magnetron can be built. A Virtual Instrument was created in LabVIEW, and data was taken. The resulting data allowed for the creation of many constant lines of frequency and output power. Additionally, the results provided a characterization of magnetron oven temperature drift over the operation time and the relationship between anode current and frequency. Using these results, the control model of different variables and their feedback or feedforward that affect the frequency pushing and pulling of the magnetron is better developed. Department of Energy, Science Undergraduate Laboratory Internships, and Jefferson Lab.

  16. An inverted cylindrical sputter magnetron as metal vapor supply for electron cyclotron resonance ion sources

    Energy Technology Data Exchange (ETDEWEB)

    Weichsel, T., E-mail: tim.weichsel@fep.fraunhofer.de; Hartung, U.; Kopte, T. [Fraunhofer Institute for Electron Beam and Plasma Technology, 01277 Dresden (Germany); Zschornack, G. [Institute of Solid State Physics, Dresden University of Technology, 01062 Dresden, Germany and Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Dresden (Germany); Kreller, M.; Silze, A. [DREEBIT GmbH, 01900 Grossroehrsdorf (Germany)

    2014-05-15

    An inverted cylindrical sputter magnetron device has been developed. The magnetron is acting as a metal vapor supply for an electron cyclotron resonance (ECR) ion source. FEM simulation of magnetic flux density was used to ensure that there is no critical interaction between both magnetic fields of magnetron and ECR ion source. Spatially resolved double Langmuir probe and optical emission spectroscopy measurements show an increase in electron density by one order of magnitude from 1 × 10{sup 10} cm{sup −3} to 1 × 10{sup 11} cm{sup −3}, when the magnetron plasma is exposed to the magnetic mirror field of the ECR ion source. Electron density enhancement is also indicated by magnetron plasma emission photography with a CCD camera. Furthermore, photographs visualize the formation of a localized loss-cone - area, when the magnetron is operated at magnetic mirror field conditions. The inverted cylindrical magnetron supplies a metal atom load rate of R > 1 × 10{sup 18} atoms/s for aluminum, which meets the demand for the production of a milliampere Al{sup +} ion beam.

  17. Prostate brachytherapy - discharge

    Science.gov (United States)

    Implant therapy - prostate cancer - discharge; Radioactive seed placement - discharge ... You had a procedure called brachytherapy to treat prostate cancer. Your treatment lasted 30 minutes or more, ...

  18. Planar Elongation Measurements on Soft Elastomers

    DEFF Research Database (Denmark)

    Jensen, Mette Krog; Skov, Anne Ladegaard; Rasmussen, Henrik K.

    2009-01-01

    A new fixture to the filament stretch rheometer (FSR) has been developed to measure planar elongation of soft polymeric networks. To validate this new technique, soft polymeric networks of poly(propyleneoxide) (PPO) were investigated during deformation.......A new fixture to the filament stretch rheometer (FSR) has been developed to measure planar elongation of soft polymeric networks. To validate this new technique, soft polymeric networks of poly(propyleneoxide) (PPO) were investigated during deformation....

  19. Generators for finite depth subfactor planar algebras

    Indian Academy of Sciences (India)

    The main result of Kodiyalam and Tupurani [3] shows that a subfactor planar algebra of finite depth is singly generated with a finite presentation. If P is a subfactor planar algebra of depth k, it is shown there that a single 2k-box generates P. It is natural to ask what the smallest s is such that a single s-box generates P. While ...

  20. Planar half-cell shaped precursor body

    DEFF Research Database (Denmark)

    2015-01-01

    The invention relates to a half-cell shaped precursor body of either anode type or cathode type, the half-cell shaped precursor body being prepared to be free sintered to form a sintered or pre-sintered half-cell being adapted to be stacked in a solid oxide fuel cell stack. The obtained half......-cell has an improved planar shape, which remains planar also after a sintering process and during temperature fluctuations....

  1. Planarity certification of ATLAS Micromegas detector panels

    Energy Technology Data Exchange (ETDEWEB)

    Mueller, Ralph; Biebel, Otmar; Bortfeldt, Jonathan; Flierl, Bernhard; Hertenberger, Ralf; Loesel, Philipp; Herrmann, Maximilian [LMU Muenchen (Germany); Zibell, Andre [JMU Wuerzburg (Germany)

    2016-07-01

    During the second long LHC shutdown, 2019/20, the precision tracking detectors of the ATLAS muon spectrometer in the inner end caps will be replaced using Micromegas, a planar gas-detector technology. Modules of 2 m{sup 2} area are built in quadruplets from five precisely planar sandwich panels that define the anodes and the cathodes of the four active detector planes. A panel is composed of three consecutive layers FR4 - aluminum honeycomb - FR4. Single plane spatial particle resolution below 100 μm is achievable when the deviations from planarity of the strip-anodes do not exceed 80 μm RMS over the whole active area and the parallelism of the readout strips is within 30 μm. In order to measure the dimensional accuracy of each panel, laser distance sensors combined with a coordinate measurement system have been investigated. The sensor requirements to measure the planarity of the panels are a resolution of 0.3 μm and a beam spot diameter of ∼20 μm, well below 100 μ m the size of the smallest structures. We report on achieved planarities of the panels and the performance of the laser sensor system. A panel with an RMS better than 30 μm was build and the evolution of its planarity due to humidity and temperature effects is shown.

  2. Simulation Study Using an Injection Phase-locked Magnetron as an Alternative Source for SRF Accelerators

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Haipeng [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Plawski, Tomasz E. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Rimmer, Robert A. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States)

    2015-09-01

    As a drop-in replacement for the CEBAF CW klystron system, a 1497 MHz, CW-type high-efficiency magnetron using injection phase lock and amplitude variation is attractive. Amplitude control using magnetic field trimming and anode voltage modulation has been studied using analytical models and MATLAB/Simulink simulations. Since the 1497 MHz magnetron has not been built yet, previously measured characteristics of a 2.45GHz cooker magnetron are used as reference. The results of linear responses to the amplitude and phase control of a superconducting RF (SRF) cavity, and the expected overall benefit for the current CEBAF and future MEIC RF systems are presented in this paper.

  3. Growth, structure and magnetic properties of magnetron sputtered FePt thin films

    Energy Technology Data Exchange (ETDEWEB)

    Cantelli, Valentina

    2010-07-01

    The L1{sub 0} FePt phase belongs to the most promising hard ferromagnetic materials for high density recording media. The main challenges for thin FePt films are: (i) to lower the process temperature for the transition from the soft magnetic A1 to the hard magnetic L1{sub 0} phase, (ii) to realize c-axes preferential oriented layers independently from the substrate nature and (iii) to control layer morphology supporting the formation of FePt-L1{sub 0} selforganized isolated nanoislands towards an increase of the signal-to-noise ratio. In this study, dc magnetron sputtered FePt thin films on amorphous substrates were investigated. The work is focused on the correlation between structural and magnetic properties with respect to the influence of deposition parameters like growth mode (cosputtering vs. layer - by - layer) and the variation of the deposition gas (Ar, Xe) or pressure (0.3-3 Pa). In low-pressure Ar discharges, high energetic particle impacts support vacancies formation during layer growth lowering the phase transition temperature to (320{+-}20) C. By reducing the particle kinetic energy in Xe discharges, highly (001) preferential oriented L1{sub 0}-FePt films were obtained on a-SiO{sub 2} after vacuum annealing. L1{sub 0}-FePt nano-island formation was supported by the introduction of an Ag matrix, or by random ballistic aggregation and atomic self shadowing realized by FePt depositions at very high pressure (3 Pa). The high coercivity (1.5 T) of granular, magnetic isotropic FePt layers, deposited in Ar discharges, was measured with SQUID magnetometer hysteresis loops. For non-granular films with (001) preferential orientation the coercivity decreased (0.6 T) together with an enhancement of the out-of- plane anisotropy. Nanoislands show a coercive field close to the values obtained for granular layers but exhibit an in-plane easy axis due to shape anisotropy effects. An extensive study with different synchrotron X-ray scattering techniques, mainly

  4. Electron energy distribution function in a cathode fall region of DC-glow discharge

    International Nuclear Information System (INIS)

    Elakshar, F.F.; Garamoon, A.A.; Hassouba, M.A.

    1997-01-01

    Recently a substantial effort has been devoted towards the development of a quantitative microscopic measurements in the cathode fall region of the DC-glow discharge magnetron sputtering unit. The electron energy distribution function (EEDF) has been measured using a single Langmuir probe at the edge of the cathode fall. Two groups of electrons are observed in helium and argon gas discharges. The two groups have no chance to be thermalized since they leave the cathode fall region fast. The electron temperature measurements have been compared with spectroscopic determination. Plasma density has been computed and compared with probe measurements. Sources of the two groups of electrons are also discussed. (author)

  5. Spatiotemporal synchronization of drift waves in a magnetron sputtering plasma

    Energy Technology Data Exchange (ETDEWEB)

    Martines, E.; Zuin, M.; Cavazzana, R.; Antoni, V.; Serianni, G.; Spolaore, M.; Vianello, N. [Consorzio RFX, Padova (Italy); Adámek, J. [Institute of Plasma Physics AS CR, Prague (Czech Republic)

    2014-10-15

    A feedforward scheme is applied for drift waves control in a magnetized magnetron sputtering plasma. A system of driven electrodes collecting electron current in a limited region of the explored plasma is used to interact with unstable drift waves. Drift waves actually appear as electrostatic modes characterized by discrete wavelengths of the order of few centimeters and frequencies of about 100 kHz. The effect of external quasi-periodic, both in time and space, travelling perturbations is studied. Particular emphasis is given to the role played by the phase relation between the natural and the imposed fluctuations. It is observed that it is possible by means of localized electrodes, collecting currents which are negligible with respect to those flowing in the plasma, to transfer energy to one single mode and to reduce that associated to the others. Due to the weakness of the external action, only partial control has been achieved.

  6. Spatiotemporal synchronization of drift waves in a magnetron sputtering plasma

    International Nuclear Information System (INIS)

    Martines, E.; Zuin, M.; Cavazzana, R.; Antoni, V.; Serianni, G.; Spolaore, M.; Vianello, N.; Adámek, J.

    2014-01-01

    A feedforward scheme is applied for drift waves control in a magnetized magnetron sputtering plasma. A system of driven electrodes collecting electron current in a limited region of the explored plasma is used to interact with unstable drift waves. Drift waves actually appear as electrostatic modes characterized by discrete wavelengths of the order of few centimeters and frequencies of about 100 kHz. The effect of external quasi-periodic, both in time and space, travelling perturbations is studied. Particular emphasis is given to the role played by the phase relation between the natural and the imposed fluctuations. It is observed that it is possible by means of localized electrodes, collecting currents which are negligible with respect to those flowing in the plasma, to transfer energy to one single mode and to reduce that associated to the others. Due to the weakness of the external action, only partial control has been achieved

  7. Magnetron with flux switching cathode and method of operation

    Science.gov (United States)

    Aaron, D.B.; Wiley, J.D.

    1989-09-12

    A magnetron sputtering apparatus is formed with a plurality of cells each for generating an independent magnetic field within a different region in the chamber of the apparatus. Each magnetic field aids in maintaining an ion plasma in the respective region of the chamber. One of a plurality of sputtering material targets is positioned on an electrode adjacent to each region so that said ions strike the target ejecting some of the target material. By selectively generating each magnetic field, the ion plasma may be moved from region to region to sputter material from different targets. The sputtered material becomes deposited on a substrate mounted on another electrode within the chamber. The duty cycle of each cell can be dynamically varied during the deposition to produce a layer having a graded composition throughout its thickness. 5 figs.

  8. Crystalline silicon films grown by pulsed dc magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Reinig, Peter; Fenske, Frank; Fuhs, Walther; Selle, Burkhardt [Hahn-Meitner-Institut Berlin, Abt. Silizium-Photovoltaik, Kekulestr. 5, D-12489 Berlin (Germany)

    2002-04-01

    Pulsed dc magnetron sputtering is used as a novel method for the deposition of crystalline silicon films on glass substrates. Hydrogen-free polycrystalline Si-films are deposited with high deposition rates at temperatures of 400-450 C and pulse frequencies f in the range 0-250 kHz. Strong preferential (100) orientation of the crystallites is observed with increasing f. High frequency and similarly high negative substrate bias cause an increase of the Ar content and an enhancement of structural disorder. Measurements of the transient floating potential suggest that the observed structural effects are related to bombardment of the growing film by Ar{sup +} ions of high energy.

  9. Characterisation of magnetron sputtered SmCo5 thin films

    International Nuclear Information System (INIS)

    Wang, Y.; Sood, D.K.; Kothari

    1999-01-01

    SmCo 5 thin films were deposited using DC magnetron sputtering on single crystal silicon substrate with chromium and SiO 2 top layers. Deposition was carried out at three different substrate temperatures: room temperature, 400 deg C and 600 deg C. Films were characterised by using Rutherford Backscattering Spectroscopy (RBS), X-ray Diffraction (XRD), Secondary Ion Mass Spectrometry (SIMS) and SQUID magnetometer. RBS analysis indicated that the films have excellent stoichiometry with the Sm to Co ratio of 1:5. This analysis also showed that the films deposited or annealed at high temperatures (≥600 deg C) indicated significant inter-diffusion at the interface between the barrier layer and the film. Oxygen was found to be the major impurity in the films. XRD data indicated that the films formed 1:5 and 2:17 phases under different deposition conditions. The preliminary studies of these films using magnetic force microscopy revealed the presence of magnetic domains

  10. Hydrogenated TiO2 Thin Film for Accelerating Electron Transport in Highly Efficient Planar Perovskite Solar Cells.

    Science.gov (United States)

    Yao, Xin; Liang, Junhui; Li, Yuelong; Luo, Jingshan; Shi, Biao; Wei, Changchun; Zhang, Dekun; Li, Baozhang; Ding, Yi; Zhao, Ying; Zhang, Xiaodan

    2017-10-01

    Intensive studies on low-temperature deposited electron transport materials have been performed to improve the efficiency of n-i-p type planar perovskite solar cells to extend their application on plastic and multijunction device architectures. Here, a TiO 2 film with enhanced conductivity and tailored band edge is prepared by magnetron sputtering at room temperature by hydrogen doping (HTO), which accelerates the electron extraction from perovskite photoabsorber and reduces charge transfer resistance, resulting in an improved short circuit current density and fill factor. The HTO film with upward shifted Fermi level guarantees a smaller loss on V OC and facilitates the growth of high-quality absorber with much larger grains and more uniform size, leading to devices with negligible hysteresis. In comparison with the pristine TiO 2 prepared without hydrogen doping, the HTO-based device exhibits a substantial performance enhancement leading to an efficiency of 19.30% and more stabilized photovoltaic performance maintaining 93% of its initial value after 300 min continuous illumination in the glove box. These properties permit the room-temperature magnetron sputtered HTO film as a promising electron transport material for flexible and tandem perovskite solar cell in the future.

  11. Bonding structure and morphology of chromium oxide films grown by pulsed-DC reactive magnetron sputter deposition

    Energy Technology Data Exchange (ETDEWEB)

    Gago, R., E-mail: rgago@icmm.csic.es [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, E-28049 Madrid (Spain); Vinnichenko, M. [Fraunhofer-Institut für Keramische Technologien und Systeme IKTS, D-01277 Dresden (Germany); Hübner, R. [Helmholtz-Zentrum Dresden – Rossendorf, Institute of Ion Beam Physics and Materials Research, Bautzner Landstraße 400, 01328 Dresden (Germany); Redondo-Cubero, A. [Departamento de Física Aplicada and Centro de Microanálisis de Materiales, Universidad Autónoma de Madrid, E-28049 Madrid (Spain)

    2016-07-05

    Chromium oxide (CrO{sub x}) thin films were grown by pulsed-DC reactive magnetron sputter deposition in an Ar/O{sub 2} discharge as a function of the O{sub 2} fraction in the gas mixture (ƒ) and for substrate temperatures, T{sub s}, up to 450 °C. The samples were analysed by Rutherford backscattering spectrometry (RBS), spectroscopic ellipsometry (SE), atomic force microscopy (AFM), scanning (SEM) and transmission (TEM) electron microscopy, X-ray diffraction (XRD), and X-ray absorption near-edge structure (XANES). On unheated substrates, by increasing ƒ the growth rate is higher and the O/Cr ratio (x) rises from ∼2 up to ∼2.5. Inversely, by increasing T{sub s} the atomic incorporation rate drops and x falls to ∼1.8. XRD shows that samples grown on unheated substrates are amorphous and that nanocrystalline Cr{sub 2}O{sub 3} (x = 1.5) is formed by increasing T{sub s}. In amorphous CrO{sub x}, XANES reveals the presence of multiple Cr environments that indicate the growth of mixed-valence oxides, with progressive promotion of hexavalent states with ƒ. XANES data also confirms the formation of single-phase nanocrystalline Cr{sub 2}O{sub 3} at elevated T{sub s}. These structural changes also reflect on the optical and morphological properties of the films. - Highlights: • XANES of CrO{sub x} thin films grown by pulsed-DC reactive magnetron sputtering. • Identification of mixed-valence amorphous CrO{sub x} oxides on unheated substrates. • Promotion of amorphous chromic acid (Cr{sup VI}) by increasing O{sub 2} partial pressure. • Production of single-phase Cr{sub 2}O{sub 3} films by increasing substrate temperature. • Correlation of bonding structure with morphological and optical properties.

  12. Double layers in a modestly collisional electronegative discharge

    CERN Document Server

    Sheridan, T E

    1999-01-01

    The effect of ion-neutral collisions on the structure and ion flux emanating from a steady-state, planar discharge with two negative components is investigated. The positive ion component is modelled as a cold fluid subject to constant-mobility collisions, while the electrons and negative ions obey Boltzmann relations. The model includes the collisionless limit. When the negative ions are sufficiently cold three types of discharge structures are found. For small negative ion concentrations or high collisionality, the discharge is 'stratified', with an electronegative core and an electropositive edge. For the opposite conditions, the discharge is 'uniform' with the negative ion density remaining significant at the edge of the plasma. Between these cases lies the special case of a double-layer-stratified discharge, where quasi-neutrality is violated at the edge of the electronegative core. Double-layer-stratified solutions are robust in that they persist for moderate collisionality. Numerical solutions for fini...

  13. Narrow gap electronegative capacitive discharges

    Energy Technology Data Exchange (ETDEWEB)

    Kawamura, E.; Lieberman, M. A.; Lichtenberg, A. J. [Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720 (United States)

    2013-10-15

    Narrow gap electronegative (EN) capacitive discharges are widely used in industry and have unique features not found in conventional discharges. In this paper, plasma parameters are determined over a range of decreasing gap length L from values for which an electropositive (EP) edge exists (2-region case) to smaller L-values for which the EN region connects directly to the sheath (1-region case). Parametric studies are performed at applied voltage V{sub rf}=500 V for pressures of 10, 25, 50, and 100 mTorr, and additionally at 50 mTorr for 1000 and 2000 V. Numerical results are given for a parallel plate oxygen discharge using a planar 1D3v (1 spatial dimension, 3 velocity components) particle-in-cell (PIC) code. New interesting phenomena are found for the case in which an EP edge does not exist. This 1-region case has not previously been investigated in detail, either numerically or analytically. In particular, attachment in the sheaths is important, and the central electron density n{sub e0} is depressed below the density n{sub esh} at the sheath edge. The sheath oscillations also extend into the EN core, creating an edge region lying within the sheath and not characterized by the standard diffusion in an EN plasma. An analytical model is developed using minimal inputs from the PIC results, and compared to the PIC results for a base case at V{sub rf}=500 V and 50 mTorr, showing good agreement. Selected comparisons are made at the other voltages and pressures. A self-consistent model is also developed and compared to the PIC results, giving reasonable agreement.

  14. Relationship between plasma parameters and film microstructure in radio frequency magnetron sputter deposition of barium strontium titanate

    Science.gov (United States)

    Panda, B.; Dhar, A.; Nigam, G. D.; Bhattacharya, D.; Ray, S. K.

    1998-01-01

    Radio frequency magnetron sputtered Ba0.8Sr0.2TiO3 thin films have been deposited on silicon and Si/SiO2/SiN/Pt substrates. The analysis of plasma discharge has been carried out using the Langmuir probe technique. Both the pressure and power have been found to influence the ion density and self-bias of the target. Introduction of oxygen into the discharge effectively decreases the ion density. The structural and electrical properties have been investigated using x-ray diffraction, atomic force microscopy of deposited films and capacitance-voltage, conductance-voltage, and current density-electric field characteristics of fabricated capacitors. The growth and orientation of the films have been found to depend upon the type of substrates and deposition temperatures. The texture in the film is promoted at a pressure 0.25 Torr with a moderately high value of ion density and low ion bombardment energy. Films deposited on Si/SiO2/SiN/Pt substrate have shown higher dielectric constant (191) and lower leakage current density (2.8×10-6 A/cm2 at 100 kV/cm) compared to that on silicon.

  15. A hybrid heterojunction with reverse rectifying characteristics fabricated by magnetron sputtered TiOx and plasma polymerized aniline structure

    International Nuclear Information System (INIS)

    Sarma, Bimal K; Pal, Arup R; Bailung, Heremba; Chutia, Joyanti

    2012-01-01

    A TiO x film produced by direct current reactive magnetron sputtering without substrate heating or post-deposition annealing and a plasma polymerized aniline (PPA) structure deposited in the same reactor by a radio-frequency glow discharge without the assistance of a carrier gas are used for the fabrication of a heterojunction. The gas phase discharge is investigated by a Langmuir probe and optical emission spectroscopy. The individual layers and the heterojunction are characterized for structural and optoelectronic properties. PPA has polymer-like structure and texture and is characterized by saturated-unsaturated, branched and crosslinked networks. X-ray photoelectron spectroscopy reveals a slightly reduced TiO x surface, which exhibits near band edge luminescence. The free radicals trapped in PPA readily react with oxygen when exposed to atmosphere. The heterojunction shows reverse rectifying characteristics under dark and ultraviolet (UV) irradiation. The energy levels of TiO x and PPA might exhibit reverse band bending and electrons and holes are accumulated on both sides of the heterojunction. The charge accumulation phenomena at the interface may play a key role in the device performance of a hybrid heterojunction. The current-voltage characteristic of the heterojunction is sensitive to UV light, so the structure may be used for photo-sensing applications. (paper)

  16. Contribution to crystallographical and mechanical analysis of molybdenum coatings prepared by magnetron cathode sputtering

    International Nuclear Information System (INIS)

    Bosland, P.

    1989-07-01

    Molybdenum coatings with different compression stresses are obtained by magnetron cathode sputtering by varying negative voltage applied to the substrate during deposition. Stress evolution, crystal texture and argon content are studied [fr

  17. CrN thin films prepared by reactive DC magnetron sputtering for symmetric supercapacitors

    KAUST Repository

    Wei, Binbin; Liang, Hanfeng; Zhang, Dongfang; Wu, Zhengtao; Qi, Zhengbing; Wang, Zhoucheng

    2016-01-01

    stability are promising candidates as supercapacitor electrode materials. In this work, we report the fabrication of CrN thin films using reactive DC magnetron sputtering and further their applications for symmetric supercapacitors for the first time. The Cr

  18. Chromium-nanodiamond coatings obtained by magnetron sputtering and their tribological properties

    Science.gov (United States)

    Atamanov, M. V.; Khrushchov, M. M.; Marchenko, E. A.; Shevchenko, N. V.; Levin, I. S.; Petrzhik, M. I.; Miroshnichenko, V. I.; Relianu, M. D.

    2017-07-01

    Peculiarities of structure, chemical and phase composition, micromechanical and tribological properties of chromium-based coatings obtained by magnetron-sputtering of composite and/or compacted chromium-nanodiamond targets have been investigated.

  19. NOVEL TECHNIQUE OF POWER CONTROL IN MAGNETRON TRANSMITTERS FOR INTENSE ACCELERATORS

    Energy Technology Data Exchange (ETDEWEB)

    Kazakevich, G. [MUONS Inc., Batavia; Johnson, R. [MUONS Inc., Batavia; Neubauer, M.; Lebedev, V. [Fermilab; Schappert, W. [Fermilab; Yakovlev, V. [Fermilab

    2016-10-21

    A novel concept of a high-power magnetron transmitter allowing dynamic phase and power control at the frequency of locking signal is proposed. The transmitter compensating parasitic phase and amplitude modulations inherent in Superconducting RF (SRF) cavities within closed feedback loops is intended for powering of the intensity-frontier superconducting accelerators. The con- cept uses magnetrons driven by a sufficient resonant (in- jection-locking) signal and fed by the voltage which can be below the threshold of self-excitation. This provides an extended range of power control in a single magnetron at highest efficiency minimizing the cost of RF power unit and the operation cost. Proof-of-principle of the proposed concept demonstrated in pulsed and CW regimes with 2.45 GHz, 1kW magnetrons is discussed here. A conceptual scheme of the high-power transmitter allowing the dynamic wide-band phase and y power controls is presented and discussed.

  20. Additive manufactured Ti6Al4V scaffolds with the RF- magnetron sputter deposited hydroxyapatite coating

    International Nuclear Information System (INIS)

    Chudinova, E; Surmeneva, M; Surmenev, R; Koptioug, A; Scoglund, P

    2016-01-01

    Present paper reports on the results of surface modification of the additively manufactured porous Ti6Al4V scaffolds. Radio frequency (RF) magnetron sputtering was used to modify the surface of the alloy via deposition of the biocompatible hydroxyapatite (HA) coating. The surface morphology, chemical and phase composition of the HA-coated alloy were studied. It was revealed that RF magnetron sputtering allows preparing a homogeneous HA coating onto the entire surface of scaffolds. (paper)

  1. Small grain size zirconium-based coatings deposited by magnetron sputtering at low temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Jimenez, O., E-mail: omar.jimenez.udg@gmail.com [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, AP 307, CP 45101 Zapopan, Jal (Mexico); Department of Materials Science and Engineering, The University of Sheffield, Sheffield S1 3JD (United Kingdom); Audronis, M.; Leyland, A. [Department of Materials Science and Engineering, The University of Sheffield, Sheffield S1 3JD (United Kingdom); Flores, M.; Rodriguez, E. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, AP 307, CP 45101 Zapopan, Jal (Mexico); Kanakis, K.; Matthews, A. [Department of Materials Science and Engineering, The University of Sheffield, Sheffield S1 3JD (United Kingdom)

    2015-09-30

    Hard, partly amorphous, ZrTiB(N) coatings were deposited by Physical Vapour Deposition (PVD) onto (111) silicon wafers at low substrate temperatures of 85 and 110 °C using Closed Field Unbalanced Magnetron Sputtering. A segmented rectangular sputter target composed of three pieces (Zr/TiB{sub 2}/Zr) was used as the source of evaporation of coating components. Two different substrate biases (i.e. floating potential and − 50 V) and N{sub 2} reactive-gas flow rates of 2, 4 and 6 sccm were employed as the main deposition parameter variables. The chemical composition, structure, morphology and mechanical properties were investigated using a variety of analytical techniques such as Glow-Discharge Optical Emission Spectroscopy, cross-sectional Scanning Electron Microscopy (SEM), Glancing Angle X-ray Diffraction (GAXRD) and nanoindentation. With other parameters fixed, coating properties were found to be dependent on the substrate negative bias and nitrogen flow rate. Linear scan profiles and SEM imaging revealed that all coatings were smooth, dense and featureless (in fracture cross section) with no apparent columnar morphology or macro-defects. GAXRD structural analysis revealed that mostly metallic phases were formed for coatings containing no nitrogen, whereas a solid solution (Zr,Ti)N single phase nitride was found in most of the reactively deposited coatings — exhibiting a very small grain size due to nitrogen and boron grain refinement effects. Hardness values from as low as 8.6 GPa up to a maximum of 25.9 GPa are related mainly to solid solution strengthening effects. The measured elastic moduli correlated with the trends in hardness behaviour; values in the range of 120–200 GPa were observed depending on the selected deposition parameters. Also, high H/E values (> 0.1) were achieved with several of the coatings.

  2. Experimental observation of nonlinear behaviour in a helium plasma discharge in the presence of a nonuniform magnetic field

    International Nuclear Information System (INIS)

    Toma, M.; Sanduloviciu, M.

    1994-01-01

    The nonlinear behaviour in an electrical discharge plasma due to the action of an external nonuniform magnetic field is presented. The discharge geometry and the magnetic field configuration ('inverse' cylindrical magnetron discharge) were so chosen that there is a possibility to control the net electron flux in a certain region of a positive electrode. The plasma discharge nonlinearity manifested in the profile of the current-voltage, current-magnetic field and current-gas pressure characteristics by the appearance of the anomalous negative resistance, in the bistability and hysteresis and also in the periodical and chaotic variation of the discharge current. The profile of the current variation vs control discharge parameters was related to the appearance of a space charge structure in the shape of nearly spherical bulges, delimited from the surrounding plasma by a double layer. (Author)

  3. Recent progress in thin film processing by magnetron sputtering with plasma diagnostics

    International Nuclear Information System (INIS)

    Han, Jeon G

    2009-01-01

    The precise control of the structure and related properties becomes crucial for sophisticated applications of thin films deposited by magnetron sputtering in emerging industries including the flat panel display, digital electronics and nano- and bio-industries. The film structure is closely related to the total energy delivered to the substrate surface for nucleation and growth during all kinds of thin film processes, including magnetron sputtering. Therefore, the energy delivered to the surface for nucleation and growth during magnetron sputtering should be measured and analysed by integrated diagnostics of the plasma parameters which are closely associated with the process parameters and other external process conditions. This paper reviews the background of thin film nucleation and growth, the status of magnetron sputtering technology and the progress of plasma diagnostics for plasma processing. The evolution of the microstructure during magnetron sputtering is then discussed with respect to the change in the process variables in terms of the plasma parameters along with empirical data of the integrated plasma diagnostics for various magnetron sputtering conditions with conventional dc, pulsed dc and high power pulsed dc sputtering modes. Among the major energy terms to be discussed are the temperature change in the top surface region and the energies of ions and neutral species. (topical review)

  4. Pulsed Power Generators For Two-section Lia Relativistic Magnetron Driver

    CERN Document Server

    Agafonov, A V; Pevchev, V P

    2004-01-01

    Two prototypes of pulsed power generators for a two-sectional LIA - specialized driver of a relativistic magnetron were constructed and tested. The driver for the double-sided powering of a relativistic magnetron consists of two identical sets of induction modules (two sections of LIA) with inner electrodes - vacuum adders connected to both sides of a coaxial magnetron. It provides the symmetric power flowing in a magnetron and a possibility of localising of the electron flow in magnetron interaction region. The first generator designed for a small-scale laboratory installation provides the output pulses of 100 ns in duration with voltage amplitude of 50 kV at repetition rate of 1 pps. The construction of the generator is based on the application of experimental capacitor banks designed as a pulse forming line with the next parameters: charging voltage - 80 kV, impedance - 1,7 Ohm, pulse duration - 80 ns at a matched load. The second generator was designed for 1 MV integrated LIA - magnetron system. It cons...

  5. A novel injection-locked amplitude-modulated magnetron at 1497 MHz

    Energy Technology Data Exchange (ETDEWEB)

    Neubauer, Michael [Muons Inc., Batavia, IL (United States); Wang, Haipeng [Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)

    2015-12-15

    Thomas Jefferson National Accelerator Facility (JLab) uses low efficiency klystrons in the CEBAF machine. In the older portion they operate at 30% efficiency with a tube mean time between failure (MTBF) of five to six years. A highly efficient source (>55-60%) must provide a high degree of backwards compatibility, both in size and voltage requirements, to replace the klystron presently used at JLab, while providing energy savings. Muons, Inc. is developing a highly reliable, highly efficient RF source based upon a novel injection-locked amplitude modulated (AM) magnetron with a lower total cost of ownership, >80% efficiency, and MTBF of six to seven years. The design of the RF source is based upon a single injection-locked magnetron system at 8 kW capable of operating up to 13 kW, using the magnetron magnetic field to achieve the AM required for backwards compatibility to compensate for microphonics and beam loads. A novel injection-locked 1497 MHz 8 kW AM magnetron with a trim magnetic coil was designed and its operation numerically simulated during the Phase I project. The low-level RF system to control the trim field and magnetron anode voltage was designed and modeled for operation at the modulation frequencies of the microphonics. A plan for constructing a prototype magnetron and control system was developed.

  6. Evanescent field refractometry in planar optical fiber.

    Science.gov (United States)

    Holmes, Christopher; Jantzen, Alexander; Gray, Alan C; Gow, Paul C; Carpenter, Lewis G; Bannerman, Rex H S; Gates, James C; Smith, Peter G R

    2018-02-15

    This Letter demonstrates a refractometer in integrated optical fiber, a new optical platform that planarizes fiber using flame hydrolysis deposition (FHD). The unique advantage of the technology is survivability in harsh environments. The platform is mechanically robust, and can survive elevated temperatures approaching 1000°C and exposure to common solvents, including acetone, gasoline, and methanol. For the demonstrated refractometer, fabrication was achieved through wet etching an SMF-28 fiber to a diameter of 8 μm before FHD planarization. An external refractive index was monitored using fiber Bragg gratings (FBGs), written into the core of the planarized fiber. A direct comparison to alternative FBG refractometers is made, for which the developed platform is shown to have comparable sensitivity, with the added advantage of survivability in harsh environments.

  7. Technical errors in planar bone scanning.

    Science.gov (United States)

    Naddaf, Sleiman Y; Collier, B David; Elgazzar, Abdelhamid H; Khalil, Magdy M

    2004-09-01

    Optimal technique for planar bone scanning improves image quality, which in turn improves diagnostic efficacy. Because planar bone scanning is one of the most frequently performed nuclear medicine examinations, maintaining high standards for this examination is a daily concern for most nuclear medicine departments. Although some problems such as patient motion are frequently encountered, the degraded images produced by many other deviations from optimal technique are rarely seen in clinical practice and therefore may be difficult to recognize. The objectives of this article are to list optimal techniques for 3-phase and whole-body bone scanning, to describe and illustrate a selection of deviations from these optimal techniques for planar bone scanning, and to explain how to minimize or avoid such technical errors.

  8. Planar quantum squeezing and atom interferometry

    Energy Technology Data Exchange (ETDEWEB)

    He, Q. Y.; Drummond, P. D.; Reid, M. D. [ARC Centre of Excellence for Quantum-Atom Optics, Centre for Atom Optics and Ultrafast Spectroscopy, Swinburne University of Technology, Melbourne 3122 (Australia); Peng Shiguo [Department of Physics, Tsinghua University, Beijing 100084 (China)

    2011-08-15

    We obtain a lower bound on the sum of two orthogonal spin component variances in a plane. This gives a planar uncertainty relation which holds even when the Heisenberg relation is not useful. We investigate the asymptotic, large-J limit and derive the properties of the planar quantum squeezed states that saturate this uncertainty relation. These states extend the concept of spin squeezing to any two conjugate spin directions. We show that planar quantum squeezing can be achieved experimentally as the ground state of a Bose-Einstein condensate in two coupled potential wells with a critical attractive interaction. These states reduce interferometric phase noise at all phase angles simultaneously. This is useful for one-shot interferometric phase measurements where the measured phase is completely unknown. Our results can also be used to derive entanglement criteria for multiple spins J at separated sites, with applications in quantum information.

  9. Inkjet-based adaptive planarization (Conference Presentation)

    Science.gov (United States)

    Singhal, Shrawan; Grigas, Michelle M.; Khusnatdinov, Niyaz; Sreenivasan, Srinivasan V.

    2017-03-01

    Planarization is a critical unit step in the lithography process because it enables patterning of surfaces with versatile pattern density without compromising on the stringent planarity and depth-of-focus requirements. In addition to nanoscale pattern density variation, parasitics such as pre-existing wafer topography, can corrupt the desired process output after planarization. The topography of any surface can be classified in three broad categories, depending upon the amplitude and spatial wavelength of the same [1], [2]: (i) nominal shape, (ii) nanotopography and (iii) roughness. The nominal shape is given by the largest spatial wavelengths, typically back is one technique used for micron scale device manufacturing [3]. As the name implies, a glass dielectric is spin-coated on the substrate followed by etching in a chemistry that ensures equal etching rates for both the sacrificial glass and the underlying film or substrate material. Photoresists may also be used instead of glass. However, the global planarity that can be achieved by this technique is limited. Also, planarization over a large isolated topographical feature has been studied for the reverse-tone Jet-and-Flash Imprint Lithography process, also known as JFIL-R [4]. This relies on surface tension and capillary effects to smoothen a spin-coated Si containing film that can be etched to obtain a smooth profile. To meet the stringent requirement of planarity in submicron device technologies Chemical Mechanical Planarization (CMP) is the most widely used planarization technology [5], [6]. It uses a combination of abrasive laden chemical slurry and a mechanical pad for achieving planar profiles. The biggest concern with CMP is the dependence of material removal rate on the pattern density of material, leading to the formation of a step between the high density and low-density. The step shows up as a long-range thickness variation in the planarized film, similar in scale to pre-existing substrate topography

  10. Planar dynamical systems selected classical problems

    CERN Document Server

    Liu, Yirong; Huang, Wentao

    2014-01-01

    This book presents in an elementary way the recent significant developments in the qualitative theory of planar dynamical systems. The subjects are covered as follows: the studies of center and isochronous center problems, multiple Hopf bifurcations and local and global bifurcations of the equivariant planar vector fields which concern with Hilbert's 16th problem. This book is intended for graduate students, post-doctors and researchers in the area of theories and applications of dynamical systems. For all engineers who are interested the theory of dynamical systems, it is also a reasona

  11. First demonstration and performance of an injection locked continuous wave magnetron to phase control a superconducting cavity

    Directory of Open Access Journals (Sweden)

    A. C. Dexter

    2011-03-01

    Full Text Available The applications of magnetrons to high power proton and cw electron linacs are discussed. An experiment is described where a 2.45 GHz magnetron has been used to drive a single cell superconducting cavity. With the magnetron injection locked, a modest phase control accuracy of 0.95° rms has been demonstrated. Factors limiting performance have been identified.

  12. Photoluminescence of Mg_2Si films fabricated by magnetron sputtering

    International Nuclear Information System (INIS)

    Liao, Yang-Fang; Xie, Quan; Xiao, Qing-Quan; Chen, Qian; Fan, Meng-Hui; Xie, Jing; Huang, Jin; Zhang, Jin-Min; Ma, Rui; Wang, Shan-Lan; Wu, Hong-Xian; Fang, Di

    2017-01-01

    Highlights: • High quality Mg_2Si films were grown on Si (111) and glass substrates with magnetron sputtering, respectively. • The first observation of Photoluminescence (PL) of Mg_2Si films was reported. • The Mg_2Si PL emission wavelengths are almost independence on temperature in the range of 77–300 K. • The strongest PL emissions may be attributed to interstitial Mg donor level to valence band transitions. • The activation energy of Mg_2Si is determined from the quenching of major luminescence peaks. - Abstract: To understand the photoluminescence mechanisms and optimize the design of Mg_2Si-based light-emitting devices, Mg_2Si films were fabricated on silicon (111) and glass substrates by magnetron sputtering technique, and the influences of different substrates on the photoelectric properties of Mg_2Si films were investigated systematically. The crystal structure, cross-sectional morphology, composition ratios and temperature-dependent photoluminescence (PL) of the Mg_2Si films were examined using X-ray diffraction (XRD), Scanning electron microscope (SEM), energy dispersive X-ray spectroscopy (EDS) and PL measurement system, respectively. XRD results indicate that the Mg_2Si film on Si (111) displays polycrystalline structure, whereas Mg_2Si film on glass substrate is of like-monocrystalline structure.SEM results show that Mg_2Si film on glass substrate is very compact with a typical dense columnar structure, and the film on Si substrate represents slight delamination phenomenon. EDS results suggest that the stoichiometry of Mg and Si is approximately 2:1. Photoluminescence (PL) of Mg_2Si films was observed for the first time. The PL emission wavelengths of Mg_2Si are almost independence on temperature in the range of 77–300 K. The PL intensity decreases gradually with increasing temperature. The PL intensity of Mg_2Si films on glass substrate is much larger than that of Mg_2Si film on Si (111) substrate. The activation energy of 18 meV is

  13. Vessel Sewage Discharges

    Science.gov (United States)

    Vessel sewage discharges are regulated under Section 312 of the Clean Water Act, which is jointly implemented by the EPA and Coast Guard. This homepage links to information on marine sanitation devices and no discharge zones.

  14. Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride

    International Nuclear Information System (INIS)

    Shimizu, T; Villamayor, M; Helmersson, U; Lundin, D

    2016-01-01

    A simple and cost effective approach to stabilize the sputtering process in the transition zone during reactive high-power impulse magnetron sputtering (HiPIMS) is proposed. The method is based on real-time monitoring and control of the discharge current waveforms. To stabilize the process conditions at a given set point, a feedback control system was implemented that automatically regulates the pulse frequency, and thereby the average sputtering power, to maintain a constant maximum discharge current. In the present study, the variation of the pulse current waveforms over a wide range of reactive gas flows and pulse frequencies during a reactive HiPIMS process of Hf-N in an Ar–N 2 atmosphere illustrates that the discharge current waveform is a an excellent indicator of the process conditions. Activating the reactive HiPIMS peak current regulation, stable process conditions were maintained when varying the N 2 flow from 2.1 to 3.5 sccm by an automatic adjustment of the pulse frequency from 600 Hz to 1150 Hz and consequently an increase of the average power from 110 to 270 W. Hf–N films deposited using peak current regulation exhibited a stable stoichiometry, a nearly constant power-normalized deposition rate, and a polycrystalline cubic phase Hf-N with (1 1 1)-preferred orientation over the entire reactive gas flow range investigated. The physical reasons for the change in the current pulse waveform for different process conditions are discussed in some detail. (paper)

  15. Low-cost ZnO:Al transparent contact by reactive rotatable magnetron sputtering for Cu(In,Ga)Se2 solar modules

    International Nuclear Information System (INIS)

    Menner, R.; Hariskos, D.; Linss, V.; Powalla, M.

    2011-01-01

    Sputtering ZnO as transparent front contact (TCO) is standard in today's industrial scale Cu(In,Ga)Se 2 (CIGS) module manufacturing. Although innovative concepts like rotatable magnetron sputtering from ceramic targets have been realised, costs are still high due to expensive ceramic targets. Significant cost reductions are expected by using reactive sputtering of metallic targets. Therefore, ZSW and industrial partners investigated the reactive sputtering of Al-doped zinc oxide (ZAO) as TCO on CIGS absorbers of high quality and industrial relevance. The reactive DC sputtering from rotatable magnetron targets is controlled in the transition mode by adjusting oxygen flow and discharge voltage. Optimisation leads to ZAO films with a TCO quality nearly comparable to standard films deposited by DC ceramic sputtering. Scanning electron microscopy, X-ray diffraction, and Hall analyses of the ZAO films are performed. Medium-size CIGS modules are coated with reactively sputtered ZAO, resulting in 12.8% module efficiency and surpassing the efficiency of the ceramic witness device. Cd-free buffered devices are also successfully coated with reactive TCO. Damp heat stability according to IEC61646 is met by all reactively sputtered devices.

  16. Numerical Study of Planar GPR Antenna Measurements

    DEFF Research Database (Denmark)

    Meincke, Peter; Hansen, Thorkild

    2004-01-01

    The formulation of planar near-field measurements of GPR antennas determines the plane-wave spectra of the GPR antenna in terms of measurements obtained with a buried probe as the GPR antenna moves over a scan plane on the ground. A numerical study investigates how the formulation is affected by (1...

  17. Fundamental losses in planar Bragg waveguides

    NARCIS (Netherlands)

    Vinogradov, A. V.; Mitrofanov, A. N.; Popov, A. V.; Fedin, M. A.

    2007-01-01

    This paper considers a planar Bragg waveguide. The guided modes and their dissipation due to the fundamental absorption are described. In the interacting-wave approximation, an analytical relation between the characteristics of the modes and parameters of the Bragg-waveguide geometry was

  18. Development of planar detectors with active edge

    International Nuclear Information System (INIS)

    Povoli, M.; Bagolini, A.; Boscardin, M.; Dalla Betta, G.-F.; Giacomini, G.; Vianello, E.; Zorzi, N.

    2011-01-01

    We report on the first batch of planar active edge sensors fabricated at Fondazione Bruno Kessler (Trento, Italy) on the way to the development of full 3D detectors with active edges. The main design and technological aspects are reported, along with selected results from the electrical characterization of detectors and test structures.

  19. Development of planar detectors with active edge

    Energy Technology Data Exchange (ETDEWEB)

    Povoli, M., E-mail: povoli@disi.unitn.it [Dipartimento di Ingegneria e Scienza dell' Informazione, Universita di Trento, Via Sommarive, 14, I-38123 Povo di Trento (Italy); INFN, Sezione di Padova (Gruppo Collegato di Trento) (Italy); Bagolini, A.; Boscardin, M. [Fondazione Bruno Kessler, Centro per i Materiali e i Microsistemi (FBK-CMM), Via Sommarive, 18, I-38123 Povo di Trento (Italy); Dalla Betta, G.-F. [Dipartimento di Ingegneria e Scienza dell' Informazione, Universita di Trento, Via Sommarive, 14, I-38123 Povo di Trento (Italy); INFN, Sezione di Padova (Gruppo Collegato di Trento) (Italy); Giacomini, G.; Vianello, E.; Zorzi, N. [Fondazione Bruno Kessler, Centro per i Materiali e i Microsistemi (FBK-CMM), Via Sommarive, 18, I-38123 Povo di Trento (Italy)

    2011-12-01

    We report on the first batch of planar active edge sensors fabricated at Fondazione Bruno Kessler (Trento, Italy) on the way to the development of full 3D detectors with active edges. The main design and technological aspects are reported, along with selected results from the electrical characterization of detectors and test structures.

  20. Planar quark diagrams and binary spin processes

    International Nuclear Information System (INIS)

    Grigoryan, A.A.; Ivanov, N.Ya.

    1986-01-01

    Contributions of planar diagrams to the binary scattering processes are analyzed. The analysis is based on the predictions of quark-gluon picture of strong interactions for the coupling of reggeons with quarks as well as on the SU(6)-classification of hadrons. The dependence of contributions of nonplanar corrections on spins and quark composition of interacting particles is discussed

  1. Image Alignment by Piecewise Planar Region Matching

    NARCIS (Netherlands)

    Lou, Z.; Gevers, T.

    2014-01-01

    Robust image registration is a challenging problem, especially when dealing with severe changes in illumination and viewpoint. Previous methods assume a global geometric model (e.g., homography) and, hence, are only able to align images under predefined constraints (e.g., planar scenes and

  2. Constant Width Planar Computation Characterizes ACC0

    DEFF Research Database (Denmark)

    Hansen, Kristoffer Arnsfelt

    2006-01-01

    We obtain a characterization of ACC0 in terms of a natural class of constant width circuits, namely in terms of constant width polynomial size planar circuits. This is shown via a characterization of the class of acyclic digraphs which can be embedded on a cylinder surface in such a way that all...

  3. Alliances and Bisection Width for Planar Graphs

    DEFF Research Database (Denmark)

    Olsen, Martin; Revsbæk, Morten

    2013-01-01

    An alliance in a graph is a set of vertices (allies) such that each vertex in the alliance has at least as many allies (counting the vertex itself) as non-allies in its neighborhood of the graph. We show that any planar graph with minimum degree at least 4 can be split into two alliances in polyn...

  4. A planar calculus for infinite index subfactors

    OpenAIRE

    Penneys, David

    2011-01-01

    We develop an analog of Jones' planar calculus for II_1-factor bimodules with arbitrary left and right von Neumann dimension. We generalize to bimodules Burns' results on rotations and extremality for infinite index subfactors. These results are obtained without Jones' basic construction and the resulting Jones projections.

  5. A Planar Calculus for Infinite Index Subfactors

    Science.gov (United States)

    Penneys, David

    2013-05-01

    We develop an analog of Jones' planar calculus for II 1-factor bimodules with arbitrary left and right von Neumann dimension. We generalize to bimodules Burns' results on rotations and extremality for infinite index subfactors. These results are obtained without Jones' basic construction and the resulting Jones projections.

  6. Connected feedback vertex set in planar graphs

    NARCIS (Netherlands)

    Grigoriev, Alexander; Sitters, René

    2010-01-01

    We study the problem of finding a minimum tree spanning the faces of a given planar graph. We show that a constant factor approximation follows from the unconnected version if the minimum degree is 3. Moreover, we present a polynomial time approximation scheme for both the connected and unconnected

  7. Are ghosts necessary in planar gauges?

    International Nuclear Information System (INIS)

    Kummer, W.

    1988-01-01

    The introduction of Faddeev-Popov ghosts in axial gauges and especially in the ones of the planar type is not a technical necessity for the general proof of renormalization and gauge independence. It is shown that all necessary identities for Green's functions and for one-particle-irreducible vertices arise in a completely ghost-free formulation as well

  8. Early discharge following birth

    DEFF Research Database (Denmark)

    Nilsson, Ingrid M. S.; Kronborg, Hanne; Knight, Christopher H.

    2017-01-01

    .26–0.48) and primiparous compared to multiparous had an OR of 0.22 (CI 0.17–0.29) for early discharge. Other predictors for early discharge were: no induction of labour, no epidural painkiller, bleeding less than 500 ml during delivery, higher gestational age, early expected discharge and positive breastfeeding experience...

  9. Heart attack - discharge

    Science.gov (United States)

    ... and lifestyle Cholesterol - drug treatment Controlling your high blood pressure Deep vein thrombosis - discharge Dietary fats explained Fast food tips Heart attack - discharge Heart attack - what to ask your doctor Heart bypass ... pacemaker - discharge High blood pressure - what to ask your doctor How to read ...

  10. Rhodium coated mirrors deposited by magnetron sputtering for fusion applications

    International Nuclear Information System (INIS)

    Marot, L.; De Temmerman, G.; Oelhafen, P.; Covarel, G.; Litnovsky, A.

    2007-01-01

    Metallic mirrors will be essential components of all optical spectroscopy and imaging systems for ITER plasma diagnostics. Any change in the mirror performance, in particular, its reflectivity, due to erosion of the surface by charge exchange neutrals or deposition of impurities will influence the quality and reliability of the detected signals. Due to its high reflectivity in the visible wavelength range and its low sputtering yield, rhodium appears as an attractive material for first mirrors in ITER. However, the very high price of the raw material calls for using it in the form of a film deposited onto metallic substrates. The development of a reliable technique for the preparation of high reflectivity rhodium films is therefore of the highest importance. Rhodium layers with thicknesses of up to 2 μm were produced on different substrates of interest (Mo, stainless steel, Cu) by magnetron sputtering. Produced films exhibit a low roughness and crystallite size of about 10 nm with a dense columnar structure. No impurities were detected on the surface after deposition. Scratch tests demonstrate that adhesion properties increase with substrate hardness. Detailed optical characterizations of Rh-coated mirrors as well as results of erosion tests performed both under laboratory conditions and in the TEXTOR tokamak are presented in this paper

  11. DC Magnetron Sputtered IZTO Thin Films for Organic Photovoltaic Application.

    Science.gov (United States)

    Lee, Hye Ji; Noviyana, Imas; Putri, Maryane; Koo, Chang Young; Lee, Jung-A; Kim, Jeong-Joo; Jeong, Youngjun; Lee, Youngu; Lee, Hee Young

    2018-02-01

    IZTO20 (In0.6Zn0.2Sn0.2O1.5) ceramic target was prepared from oxide mixture of In2O3, ZnO, and SnO2 powders. IZTO20 thin films were then deposited onto glass substrate at 400 °C by DC magnetron sputtering. The average optical transmittance determined by ultraviolet-visible spectroscopy was higher than 85% for all films. The minimum resistivity of the annealed IZTO20 thin film was approximately 6.1×10-4 Ω·cm, which tended to increase with decreasing indium content. Substrate heating and annealing were found to be important parameters affecting the electrical and optical properties. An organic photovoltaic (OPV) cell was fabricated using the IZTO20 film deposited under the optimized condition as an anode electrode and the efficiency of up to 80% compared to that of a similar OPV cell using ITO film was observed. Reduction of surface roughness and electrical resistivity through annealing treatment was found to contribute to the improved efficiency of the OPV cell.

  12. Textured ZnO thin films by RF magnetron sputtering

    CERN Document Server

    Ginting, M; Kang, K H; Kim, S K; Yoon, K H; Park, I J; Song, J S

    1999-01-01

    Textured thin films ZnO has been successfully grown by rf magnetron sputtering method using a special technique of introducing a small amount of water and methanol on the deposition chamber. The grain size of the textured surface is highly dependent on the argon pressure during the deposition. The pressure in this experiment was varied from 50 mTorr down to 5 mTorr and the highest grain size of the film is obtained at 5 mTorr. The total transmittance of the films are more than 85% in the wavelength of 400 to 800 nm, and haze ratio of about 14% is obtained at 400 nm wavelength. Beside the textured surface, these films also have very low resistivity, which is lower than 1.4x10 sup - sup 3 OMEGA centre dot cm. X-ray analysis shows that the films with textured surface have four diffraction peaks on the direction of (110), (002), (101) and (112), while the non-textured films have only (110) and (002) peaks. Due to the excellent characteristics of this film, it will make the film very good TCO alternatives for the ...

  13. Mechanical properties of nanocrystalline palladium prepared by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Castrup, Anna; Hahn, Horst [Forschungszentrum Karlsruhe (Germany); Technical University of Darmstadt (Germany); Scherer, Torsten; Ivanisenko, Yulia; Choi, In-Suk; Kraft, Oliver [Forschungszentrum Karlsruhe (Germany)

    2009-07-01

    Nanocrystalline metals and alloys with grain sizes well below 100 nm often demonstrate unique deformation behaviour and therefore attract a great interest in material science. The understanding of deformation mechanisms operating in nanocrystalline materials is important to predict their mechanical properties. In the present study Pd films of 1{mu}m thickness were prepared using UHV rf magnetron sputtering on dog bone shaped Kapton substrates and on Si/SiO2 wafers. The films were sputtered using multilayer technology with an individual layer thickness of 10 nm. This resulted in grain sizes of about 20 nm. Initial microstructure and texture were characterized using conventional XRD measurements and transmission electron microscopy (TEM) in both cross section- and plane view. The mechanical properties were investigated using tensile testing and nanoindentation at several strain rates. An increased hardness and strength as compared to coarse grained Pd was observed, as well as high strain rate sensitivity. The microstructure in the gauge section after tensile testing was again analyzed using TEM in order to reveal signatures of deformation mechanisms like dislocation motion or twinning.

  14. Multilayer DLC coatings via alternating bias during magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Li Fengji [School of Mechanical and Aerospace Engineering, Nanyang Technological University (Singapore); Zhang, Sam, E-mail: msyzhang@ntu.edu.sg [School of Mechanical and Aerospace Engineering, Nanyang Technological University (Singapore); Kong Junhua [School of Materials Science and Engineering, Nanyang Technological University (Singapore); Zhang Yujuan [Key Laboratory of Special Functional Material, Henan University (China); Zhang Wali [School of Mechanical and Aerospace Engineering, Nanyang Technological University (Singapore)

    2011-05-31

    To combat the high residual stress problem in monolayer diamond-like carbon coatings, this paper fabricated multilayer diamond-like carbon coatings with alternate soft and hard layers via alternating bias during magnetron sputtering. The surface, cross sectional morphology, bonding structures and mechanical properties are investigated. The atomic force microscopy images indicate low bias results in rougher surface with large graphite clusters and voids suggesting low coating density. The multilayered coatings demonstrate relatively smooth surface stemming from higher bias. The cross sectional images from field emission scanning electron microscopy indicate coating thickness decreases as substrate bias increases and confirm that higher bias results in denser coating. Delamination is observed in monolayer coatings due to high residual stress. The trend of sp{sup 3}/sp{sup 2} fraction estimated by X-ray photoelectron spectroscopy is consistent with that of I{sub D}/I{sub G} ratios from Raman spectra, indicating the change of bonding structure with change of substrate bias. Hardness of multilayer diamond-like carbon coating is comparable to the coatings deposited at low constant bias but the adhesion strength and toughness are significantly improved. Alternately biased sputtering deposition provides an alternative when combination of hardness, toughness and adhesion strength is needed in an all diamond-like carbon coating.

  15. Functional nanostructured titanium nitride films obtained by sputtering magnetron

    International Nuclear Information System (INIS)

    Sanchez, O.; Hernandez-Velez, M.; Navas, D.; Auger, M.A.; Baldonedo, J.L.; Sanz, R.; Pirota, K.R.; Vazquez, M.

    2006-01-01

    Development of new methods in the formation of hollow structures, in particular, nanotubes and nanocages are currently generating a great interest as a consequence of the growing relevance of these nanostructures on many technological fields, ranging from optoelectronics to biotechnology. In this work, we report the formation of titanium nitride (TiN) nanotubes and nanohills via reactive sputtering magnetron processes. Anodic Alumina Membranes (AAM) were used as template substrates to grow the TiN nanostructures. The AAM were obtained through electrochemical anodization processes by using oxalic acid solutions as electrolytes. The nanotubes were produced at temperatures below 100 deg. C, and using a pure titanium (99.995%) sputtering target and nitrogen as reactive gas. The obtained TiN thin films showed surface morphologies adjusted to pore diameter and interpore distance of the substrates, as well as ordered arrays of nanotubes or nanohills depending on the sputtering and template conditions. High Resolution Scanning Electron Microscopy (HRSEM) was used to elucidate both the surface order and morphology of the different grown nanostructures. The crystalline structure of the samples was examined using X-ray Diffraction (XRD) patterns and their qualitative chemical composition by using X-ray Energy Dispersive Spectroscopy (XEDS) in a scanning electron microscopy

  16. Algan/Gan Hemt By Magnetron Sputtering System

    Science.gov (United States)

    Garcia Perez, Roman

    In this thesis, the growth of the semiconductor materials AlGaN and GaN is achieved by magnetron sputtering for the fabrication of High Electron Mobility Transistors (HEMTs). The study of the deposited nitrides is conducted by spectroscopy, diffraction, and submicron scale microscope methods. The preparation of the materials is performed using different parameters in terms of power, pressure, temperature, gas, and time. Silicon (Si) and Sapphire (Al2O3) wafers are used as substrates. The chemical composition and surface topography of the samples are analyzed to calculate the materials atomic percentages and to observe the devices surface. The instruments used for the semiconductors characterization are X-ray Photoelectron Spectroscopy (XPS), X-ray Diffraction (XRD), Scanning Electron Microscopy (SEM), and Atomic Force Microscope (AFM). The project focused its attention on the reduction of impurities during the deposition, the controlled thicknesses of the thin-films, the atomic configuration of the alloy AlxGa1-xN, and the uniformity of the surfaces.

  17. Superconducting niobium nitride films deposited by unbalanced magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Olaya, J.J. [Departamento de Ingenieria Mecanica y Mecatronica, Universidad Nacional de Colombia, Ciudad Universitaria, Carrera 30 Numero 45-03, Bogota (Colombia); Huerta, L. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico); Rodil, S.E. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico)], E-mail: ser42@iim.unam.mx; Escamilla, R. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico)

    2008-10-01

    Niobium nitride (NbN) thin films were deposited under different configurations of the magnetic field using a magnetron sputtering system. The magnetic field configuration varied from balanced to unbalanced leading to different growth conditions and film properties. The aim of the paper was to identify correlations between deposition conditions, film properties and the electrical properties, specially the superconductive critical temperature (T{sub C}). The results suggested that there is a critical deposition condition, having an optimum ion-atom arrival ratio that promotes a well ordered and textured nanocrystalline structure (cubic phase) with the minimum residual stress and only under this condition a high critical temperature (16K) was obtained. Lower T{sub C} values around 12K were obtained for the NbN samples having a lower degree of structural perfection and texture, and a larger fraction of intergranular voids. On the other hand, analysis of valence-band spectra showed that the contribution of the Nb 4d states remained essentially constant while the higher T{sub C} was correlated to a higher contribution of the N 2p states.

  18. Superconducting niobium nitride films deposited by unbalanced magnetron sputtering

    International Nuclear Information System (INIS)

    Olaya, J.J.; Huerta, L.; Rodil, S.E.; Escamilla, R.

    2008-01-01

    Niobium nitride (NbN) thin films were deposited under different configurations of the magnetic field using a magnetron sputtering system. The magnetic field configuration varied from balanced to unbalanced leading to different growth conditions and film properties. The aim of the paper was to identify correlations between deposition conditions, film properties and the electrical properties, specially the superconductive critical temperature (T C ). The results suggested that there is a critical deposition condition, having an optimum ion-atom arrival ratio that promotes a well ordered and textured nanocrystalline structure (cubic phase) with the minimum residual stress and only under this condition a high critical temperature (16K) was obtained. Lower T C values around 12K were obtained for the NbN samples having a lower degree of structural perfection and texture, and a larger fraction of intergranular voids. On the other hand, analysis of valence-band spectra showed that the contribution of the Nb 4d states remained essentially constant while the higher T C was correlated to a higher contribution of the N 2p states

  19. Properties of tungsten films prepared by magnetron sputtering

    International Nuclear Information System (INIS)

    Ahn, K.Y.; Ting, C.Y.; Brodsky, S.B.; Fryer, P.M.; Davari, B.; Angillelo, J.; Herd, S.R.; Licata, T.

    1986-01-01

    High-rate magnetron sputtering is a relatively simple process to produce tungsten films with good electrical and mechanical properties, and it offers good uniformity, reproducibility, process flexibility, and high throughput. The purity of the sputtered films is affected by the target purity (cold-pressed 99.95%, chemical vapor deposited 99.99% and cast 99.999%), base pressure, deposition rate, and substrate bias. Typical resistivity in films of 2000 to 3000A thickness deposited on Si, poly-Si, and SiO/sub 2/ ranges from 10 to 12 μΩ-cm, and this may be compared with 6 and 11 μΩ-cm by high-temperature evaporation and chemical vapor deposition, respectively. The presence of biaxial stress caused by substrate scanning was determined by x-ray technique. The sputtered films exhibit high compressive stress when deposited at low Ar pressure. It decreases with increasing pressure, and eventually changes sign to become tensile, and increases further with increasing pressure. Effects of processing parameters on films properties, and a comparison of film properties prepared by evaporation and chemical vapor deposition are discussed

  20. Searching for planar signatures in WMAP

    International Nuclear Information System (INIS)

    Abramo, L. Raul; Bernui, Armando; Pereira, Thiago S.

    2009-01-01

    We search for planar deviations of statistical isotropy in the Wilkinson Microwave Anisotropy Probe (WMAP) data by applying a recently introduced angular-planar statistics both to full-sky and to masked temperature maps, including in our analysis the effect of the residual foreground contamination and systematics in the foreground removing process as sources of error. We confirm earlier findings that full-sky maps exhibit anomalies at the planar (l) and angular (l) scales (l,l) = (2,5),(4,7), and (6,8), which seem to be due to unremoved foregrounds since this features are present in the full-sky map but not in the masked maps. On the other hand, our test detects slightly anomalous results at the scales (l,l) = (10,8) and (2,9) in the masked maps but not in the full-sky one, indicating that the foreground cleaning procedure (used to generate the full-sky map) could not only be creating false anomalies but also hiding existing ones. We also find a significant trace of an anomaly in the full-sky map at the scale (l,l) = (10,5), which is still present when we consider galactic cuts of 18.3% and 28.4%. As regards the quadrupole (l = 2), we find a coherent over-modulation over the whole celestial sphere, for all full-sky and cut-sky maps. Overall, our results seem to indicate that current CMB maps derived from WMAP data do not show significant signs of anisotropies, as measured by our angular-planar estimator. However, we have detected a curious coherence of planar modulations at angular scales of the order of the galaxy's plane, which may be an indication of residual contaminations in the full- and cut-sky maps

  1. Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions

    International Nuclear Information System (INIS)

    Vasina, P; Hytkova, T; Elias, M

    2009-01-01

    The majority of current models of the reactive magnetron sputtering assume a uniform shape of the discharge current density and the same temperature near the target and the substrate. However, in the real experimental set-up, the presence of the magnetic field causes high density plasma to form in front of the cathode in the shape of a toroid. Consequently, the discharge current density is laterally non-uniform. In addition to this, the heating of the background gas by sputtered particles, which is usually referred to as the gas rarefaction, plays an important role. This paper presents an extended model of the reactive magnetron sputtering that assumes the non-uniform discharge current density and which accommodates the gas rarefaction effect. It is devoted mainly to the study of the behaviour of the reactive sputtering rather that to the prediction of the coating properties. Outputs of this model are compared with those that assume uniform discharge current density and uniform temperature profile in the deposition chamber. Particular attention is paid to the modelling of the radial variation of the target composition near transitions from the metallic to the compound mode and vice versa. A study of the target utilization in the metallic and compound mode is performed for two different discharge current density profiles corresponding to typical two pole and multipole magnetics available on the market now. Different shapes of the discharge current density were tested. Finally, hysteresis curves are plotted for various temperature conditions in the reactor.

  2. Effects of assistant anode on planar inductively coupled magnetized argon plasma in plasma immersion ion implantation

    International Nuclear Information System (INIS)

    Tang, Deli; Chu, Paul K.

    2003-01-01

    The enhancement of planar radio frequency (RF) inductively coupled argon plasma is studied in the presence of an assistant anode and an external magnetic field at low pressure. The influence of the assistant anode and magnetic field on the efficiency of RF power absorption and plasma parameters is investigated. An external axial magnetic field is coupled into the plasma discharge region by an external electromagnetic coil outside the discharge chamber and an assistant cylindrical anode is inserted into the discharge chamber to enhance the plasma discharge. The plasma parameters and density profile are measured by an electrostatic Langmuir probe at different magnetic fields and anode voltages. The RF power absorption by the plasma can be effectively enhanced by the external magnetic field compared with the nonmagnetized discharge. The plasma density can be further increased by the application of a voltage to the assistant anode. Owing to the effective power absorption and enhanced plasma discharge by the assistant anode in a longitudinal magnetic field, the plasma density can be enhanced by more than a factor of two. Meanwhile, the nonuniformity of the plasma density is less than 10% and it can be achieved in a process chamber with a diameter of 600 mm

  3. Dynamic of ozone formation in nanosecond microwave discharges

    International Nuclear Information System (INIS)

    Akhmedzhanov, R.A.; Vikharev, A.L.; Gorbachev, A.M.

    1995-01-01

    Nanosecond gas discharges are efficient sources of chemically active plasma. Studies of the nanosecond microwave discharge are interesting for remote modification of the chemical composition of the atmosphere in term of its purification, for diagnostics of impurities and ozone replenishment in the regions of local open-quotes ozone holesclose quotes. In this connection a study of plasma chemical processes in such a discharge seems appropriate, as well as modeling of ecological consequences of the effect of powerful microwave radiation on the atmosphere. The present paper contains generalized results of studying the process of ozone formation in a pulse-periodic freely localized nanosecond microwave discharge. The experiments were performed in a wide range of parameters: microwave radiation wavelength λ = 0.8 and 3cm, pulse duration τ = 6 and 500ns, pulse power P = 50kW and 20MW, pulse repetition rate F = 1-10 3 Hz. The working gases were air and oxygen under pressure P = 10-100Torr. As a source of the microwave radiation a pulse magnetron was used with a device for pulse compression based on the waveguide resonator, and a relativistic microwave generator. The discharge was produced in the focus of the parabolic mirror and had the form of homogeneous cylinder. The plasma chemical processes were studied in two cases. The discharge was created either in the quartz tube placed along the focal line of the mirror or in the free air. Dynamics of formation of ozone and nitrogen oxides in the discharge was studied by means of absorption spectroscopy in the regime of accumulation of the products of chemical reactions (in a closed volume) and their diffusion spreading

  4. ytterbium- & erbium-doped silica for planar waveguide lasers & amplifiers

    DEFF Research Database (Denmark)

    Dyndgaard, Morten Glarborg

    2001-01-01

    The purpose of this work was to demonstrate ytterbium doped planar components and investigate the possibilities of making erbium/ytterbium codoped planar waveguides in germano-silica glass. Furthermore, tools for modelling lasers and erbium/ytterbium doped amplifiers. The planar waveguides were...

  5. Proposal of limit moment equation applicable to planar/non-planar flaw in wall thinned pipes under bending

    International Nuclear Information System (INIS)

    Tsuji, Masataka; Meshii, Toshiyuki

    2011-01-01

    Highlights: → A limit moment equation applicable to planar/non-planar flaw of 0 ≤ θ ≤ π found in wall thinned straight pipes was proposed. → An idea to rationally classify planar/non-planar flaw in wall thinned pipes was proposed. → The equation based on the experimental observation focused on the fracture mode. - Abstract: In this paper, a limit bending moment equation applicable to all types of planar and non-planar flaws in wall-thinned straight pipes under bending was proposed. A system to rationally classify the planar/non-planar flaws in wall-thinned pipes was suggested based on experimental observations focused on the fracture mode. The results demonstrate the importance of distinguishing between axial and circumferential long flaws in wall-thinned pipes.

  6. MnO2 ultrathin films deposited by means of magnetron sputtering: Relationships between process conditions, structural properties and performance in transparent supercapacitors

    Science.gov (United States)

    Borysiewicz, Michał A.; Wzorek, Marek; Myśliwiec, Marcin; Kaczmarski, Jakub; Ekielski, Marek

    2016-12-01

    This study focuses on the relationships between the process parameters during magnetron sputter deposition of MnO2 and the resulting film properties. Three MnO2 phases were identified - γ, β and λ and the dependence of MnO2 phase presence on the oxygen content in the sputtering atmosphere was found. Selected MnO2 phases were subsequently applied as ultrathin coatings on top of nanostructured ZnO electrodes for transparent supercapacitors with LiCl-based gel electrolyte. The films containing λ-MnO2 exhibited both the highest optical transparency of 62% at 550 nm as well as the highest specific capacitance in the supercapacitor structure, equal to 73.1 μF/cm2. Initially lower, the capacitance was elevated by charge-discharge conditioning.

  7. Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering

    Science.gov (United States)

    Stranak, V.; Hubicka, Z.; Cada, M.; Bogdanowicz, R.; Wulff, H.; Helm, C. A.; Hippler, R.

    2018-03-01

    Iron oxide films were deposited using high power impulse magnetron sputtering (HiPIMS) of an iron cathode in an argon/oxygen gas mixture at different gas pressures (0.5 Pa, 1.5 Pa, and 5.0 Pa). The HiPIMS system was operated at a repetition frequency f  =  100 Hz with a duty cycle of 1%. A main goal is a comparison of film growth during conventional and electron cyclotron wave resonance-assisted HiPIMS. The deposition plasma was investigated by means of optical emission spectroscopy and energy-resolved mass spectrometry. Active oxygen species were detected and their kinetic energy was found to depend on the gas pressure. Deposited films were characterized by means of spectroscopic ellipsometry and grazing incidence x-ray diffraction. Optical properties and crystallinity of as-deposited films were found to depend on the deposition conditions. Deposition of hematite iron oxide films with the HiPIMS-ECWR discharge is attributed to the enhanced production of reactive oxygen species.

  8. Effect of arc suppression on the physical properties of low temperature dc magnetron sputtered tantalum thin films

    International Nuclear Information System (INIS)

    Subrahmanyam, A.; Valleti, Krishna; Joshi, Srikant V.; Sundararajan, G.

    2007-01-01

    Arcing is a common phenomenon in the sputtering process. Arcs and glow discharges emit electrons which may influence the physical properties of films. This article reports the properties of tantalum (Ta) thin films prepared by continuous dc magnetron sputtering in normal and arc-suppression modes. The substrate temperature was varied in the range of 300-673 K. The tantalum films were ∼1.8 μm thick and have good adherence to 316 stainless steel and single-crystal silicon substrates. The phase of the Ta thin film determines the electrical and tribological properties. The films deposited at 300 K using both methods were crystallized in a tetragonal structure (β phase) with a smooth surface (grain size of ∼10 nm) and exhibited an electrical resistivity of ∼194 μΩ cm and a hardness of ∼20 GPa. When the substrate temperature was 473 K and higher, the arc-suppression mode appears to influence the films to crystallize in the α phase with a grain size of ∼40 nm, whereas the normal power mode gave mixed phases β and α beyond 473 K, the arc-suppression mode yields larger grain sizes in the Ta thin films and the hardness decreases. These changes in the physical properties in arc-suppression mode are attributed to either the change in plasma characteristics or the energetic particle bombardment onto the substrate, or both

  9. Regular shock refraction in planar ideal MHD

    International Nuclear Information System (INIS)

    Delmont, P; Keppens, R

    2010-01-01

    We study the classical problem of planar shock refraction at an oblique density discontinuity, separating two gases at rest, in planar ideal (magneto)hydrodynamics. In the hydrodynamical case, 3 signals arise and the interface becomes Richtmyer-Meshkov unstable due to vorticity deposition on the shocked contact. In the magnetohydrodynamical case, on the other hand, when the normal component of the magnetic field does not vanish, 5 signals will arise. The interface then typically remains stable, since the Rankine-Hugoniot jump conditions in ideal MHD do not allow for vorticity deposition on a contact discontinuity. We present an exact Riemann solver based solution strategy to describe the initial self similar refraction phase. Using grid-adaptive MHD simulations, we show that after reflection from the top wall, the interface remains stable.

  10. Setup for in situ X-ray diffraction studies of thin film growth by magnetron sputtering

    CERN Document Server

    Ellmer, K; Weiss, V; Rossner, H

    2001-01-01

    A novel method is described for the in situ-investigation of nucleation and growth of thin films during magnetron sputtering. Energy dispersive X-ray diffraction with synchrotron light is used for the structural analysis during film growth. An in situ-magnetron sputtering chamber was constructed and installed at a synchrotron radiation beam line with a bending magnet. The white synchrotron light (1-70 keV) passes the sputtering chamber through Kapton windows and hits one of the substrates on a four-fold sample holder. The diffracted beam, observed under a fixed diffraction angle between 3 deg. and 10 deg., is energy analyzed by a high purity Ge-detector. The in situ-EDXRD setup is demonstrated for the growth of tin-doped indium oxide (ITO) films prepared by reactive magnetron sputtering from a metallic target.

  11. Improved Magnetron Stability and Reduced Noise in Efficient Transmitters for Superconducting Accelerators

    Energy Technology Data Exchange (ETDEWEB)

    Kazakevich, G. [MUONS Inc., Batavia; Johnson, R. [MUONS Inc., Batavia; Lebedev, V. [Fermilab; Yakovlev, V. [Fermilab

    2018-04-01

    State of the art high-current superconducting accelerators require efficient RF sources with a fast dynamic phase and power control. This allows for compensation of the phase and amplitude deviations of the accelerating voltage in the Superconducting RF (SRF) cavities caused by microphonics, etc. Efficient magnetron transmitters with fast phase and power control are attractive RF sources for this application. They are more cost effective than traditional RF sources such as klystrons, IOTs and solid-state amplifiers used with large scale accelerator projects. However, unlike traditional RF sources, controlled magnetrons operate as forced oscillators. Study of the impact of the controlling signal on magnetron stability, noise and efficiency is therefore important. This paper discusses experiments with 2.45 GHz, 1 kW tubes and verifies our analytical model which is based on the charge drift approximation.

  12. Planar algebra of the subgroup-subfactor

    Indian Academy of Sciences (India)

    We think of R α G as the II1-factor (R ∪{ug: g ∈ G}) ⊂ L(L2(R)), where ug(ˆx) ..... define a global trace on P, where for 0± the trace for P0± ∼= C is the obvious identity .... function for strings is either a local maximum or a local minimum. ..... In order to understand how the inclusion tangles act on the subgroup-subfactor planar.

  13. Planar graphical models which are easy

    Energy Technology Data Exchange (ETDEWEB)

    Chertkov, Michael [Los Alamos National Laboratory; Chernyak, Vladimir [WAYNE STATE UNIV

    2009-01-01

    We describe a rich family of binary variables statistical mechanics models on planar graphs which are equivalent to Gaussian Grassmann Graphical models (free fermions). Calculation of partition function (weighted counting) in the models is easy (of polynomial complexity) as reduced to evaluation of determinants of matrixes linear in the number of variables. In particular, this family of models covers Holographic Algorithms of Valiant and extends on the Gauge Transformations discussed in our previous works.

  14. Wavelet Radiosity on Arbitrary Planar Surfaces

    OpenAIRE

    Holzschuch , Nicolas; Cuny , François; Alonso , Laurent

    2000-01-01

    Colloque avec actes et comité de lecture. internationale.; International audience; Wavelet radiosity is, by its nature, restricted to parallelograms or triangles. This paper presents an innovative technique enabling wavelet radiosity computations on planar surfaces of arbitrary shape, including concave contours or contours with holes. This technique replaces the need for triangulating such complicated shapes, greatly reducing the complexity of the wavelet radiosity algorithm and the computati...

  15. Determinantal spanning forests on planar graphs

    OpenAIRE

    Kenyon, Richard

    2017-01-01

    We generalize the uniform spanning tree to construct a family of determinantal measures on essential spanning forests on periodic planar graphs in which every component tree is bi-infinite. Like the uniform spanning tree, these measures arise naturally from the laplacian on the graph. More generally these results hold for the "massive" laplacian determinant which counts rooted spanning forests with weight $M$ per finite component. These measures typically have a form of conformal invariance, ...

  16. Hairy planar black holes in higher dimensions

    Energy Technology Data Exchange (ETDEWEB)

    Aceña, Andrés [Instituto de Ciencias Básicas, Universidad Nacional de Cuyo,Mendoza (Argentina); Anabalón, Andrés [Departamento de Ciencias, Facultad de Artes Liberales y Facultad de Ingeniería y Ciencias,Universidad Adolfo Ibáñez, Viña del Mar (Chile); Université de Lyon, Laboratoire de Physique,UMR 5672, CNRS, École Normale Supérieure de Lyon,46 allé d’Italie, F-69364 Lyon Cedex 07 (France); Astefanesei, Dumitru [Instituto de Física, Pontificia Universidad Católica de Valparaíso,Casilla 4059, Valparaíso (Chile); Mann, Robert [Department of Physics and Astronomy, University of Waterloo,Waterloo, Ontario, N2L 3G1 (Canada); Perimeter Institute,31 Caroline Street North Waterloo, Ontario N2L 2Y5 (Canada)

    2014-01-28

    We construct exact hairy planar black holes in D-dimensional AdS gravity. These solutions are regular except at the singularity and have stress-energy that satisfies the null energy condition. We present a detailed analysis of their thermodynamical properties and show that the first law is satisfied. We also discuss these solutions in the context of AdS/CFT duality and construct the associated c-function.

  17. Planar Quantum Mechanics: an Intriguing Supersymmetric Example

    CERN Document Server

    Veneziano, Gabriele

    2006-01-01

    After setting up a Hamiltonian formulation of planar (matrix) quantum mechanics, we illustrate its effectiveness in a non-trivial supersymmetric example. The numerical and analytical study of two sectors of the model, as a function of 't Hooft's coupling $\\lambda$, reveals both a phase transition at $\\lambda=1$ (disappearence of the mass gap and discontinuous jump in Witten's index) and a new form of strong-weak duality for $\\lambda \\to 1/\\lambda$.

  18. Miniaturized Air-Driven Planar Magnetic Generators

    Directory of Open Access Journals (Sweden)

    Jingjing Zhao

    2015-10-01

    Full Text Available This paper presents the design, analysis, fabrication and testing of two miniaturized air-driven planar magnetic generators. In order to reduce the magnetic resistance torque, Generator 1 establishes a static magnetic field by consisting a multilayer planar coil as the stator and two multi-pole permanent-magnet (PM rotors on both sides of the coil. To further decrease the starting torque and save more space, Generator 2 adopts the multilayer planar coil as the rotor and the multi-pole PMs as the stator, eliminating the casing without compromising the magnetic structure or output performance. The prototypes were tested gathering energy from wind which can work at a low wind speed of 1~2 m/s. Prototype of Generator 1 is with a volume of 2.61 cm3 and its normalized voltage reaches 485 mV/krpm. Prototype of Generator 2 has a volume of 0.92 cm3 and a normalized voltage as high as 538 mV/krpm. Additionally, output voltage can be estimated at better than 96% accuracy by the theoretical model developed in this paper. The two micro generators are capable of producing substantial electricity with little volume to serve as compact power conversion devices.

  19. Modeling and optimization of planar microcoils

    International Nuclear Information System (INIS)

    Beyzavi, Ali; Nguyen, Nam-Trung

    2008-01-01

    Magnetic actuation has emerged as a useful tool for manipulating particles, droplets and biological samples in microfluidics. A planar coil is one of the suitable candidates for magnetic actuation and has the potential to be integrated in digital microfluidic devices. A simple model of microcoils is needed to optimize their use in actuation applications. This paper first develops an analytical model for calculating the magnetic field of a planar microcoil. The model was validated by experimental data from microcoils fabricated on printed circuit boards (PCB). The model was used for calculating the field strength and the force acting on a magnetic object. Finally, the effect of different coil parameters such as the magnitude of the electric current, the gap between the wires and the number of wire segments is discussed. Both analytical and experimental results show that a smaller gap size between wire segments, more wire segments and a higher electric current can increase both the magnitude and the gradient of the magnetic field, and consequently cause a higher actuating force. The planar coil analyzed in the paper is suitable for applications in magnetic droplet-based microfluidics

  20. Commissioning of indigenous microwave test facility for development and pilot production of 2 MW S-band magnetrons

    International Nuclear Information System (INIS)

    Shrivastava, Purushottam; Wanmode, Y.D.; Hannurkar, P.R.; Prasad, Sharda

    2005-01-01

    To have self reliance in the field of microwave devices and to have consistent supply of pulsed magnetrons for the Indian accelerator programme. CAT initiated development of 2 MW S-Band pulsed magnetrons in collaboration with CEERI, Pilani. The design, development and testing of the microwave test facilities for ageing. conditioning and performance testing of Indian magnetrons, was successfully done by CAT indigenously. After the rigorous testing. the test facility was shifted, installed and commissioned at CEERI, Pilani by CAT. Over a period of 10 years, nine prototypes were aged and tested, two magnetrons were life tested and five magnetrons under production programme have been successfully conditioned and tested. Testing of more numbers is underway. The system details. commissioning aspects are discussed, results are shown. (author)

  1. SERS spectra of pyridine adsorbed on nickel film prepared by magnetron sputtering

    Science.gov (United States)

    Li, Daoyong; Ouyang, Yu; Chen, Li; Cao, Weiran; Shi, Shaohua

    2011-02-01

    As a repeating well and cheaper enhancement substrate, the nickel film was fabricated with magnetron sputtering coating instrument. Surface enhanced Raman spectra (SERS) of pyridine adsorbed on this nickel film are compared with the experimental values of gaseous pyridine, the theoretical value of pyridine solution listed in other literatures and our method is better than electro-chemical etching electrode method for large scale preparation. The enhancement factor of the nickel film is calculated and the result indicates that magnetron sputtering coating technology is feasible for obtaining good SERS active surface.

  2. Computer analysis, design and construction of the BNL Mk V magnetron

    International Nuclear Information System (INIS)

    McKenzie-Wilson, R.B.; Kovarik, V.J.

    1981-01-01

    As part of a program to develop a high energy neutral beam injector for fusion reactor applications, the BNL Neutral Beam Group is studying, among other options, a surface plasma source of the magnetron type. This source has been developed to the point at which a large compact model, known as the Mk V magnetron, has been designed and constructed. The source is designed to operate in the steady state mode and to produce 1-2A of H - (D - ) ions at 25 kV. Under these conditions, 18 KW of heat are removed from the source by the cooling system

  3. Laterally resolved ion-distribution functions at the substrate position during magnetron sputtering of indium-tin oxide films

    International Nuclear Information System (INIS)

    Plagemann, A.; Ellmer, K.; Wiesemann, K.

    2007-01-01

    During the magnetron sputtering from an indium-tin oxide (ITO) target (76 mm diameter) we measured the ion-distribution functions (IDFs) of energetic ions (argon, indium, and oxygen ions) at the substrate surface using a combination of a quadrupole mass spectrometer and an electrostatic energy analyzer. We obtained the IDFs for argon sputtering pressures in the range from 0.08 to 2 Pa and for dc as well as rf (13.56 MHz) plasma excitation with powers from 10 to 100 W. The IDF measurements were performed both over the target center at a target-to-substrate distance of 65 mm and at different positions along the target radius in order to scan the erosion track of the target. The mean kinetic energies of argon ions calculated from the IDFs in the dc plasma decreased from about 30 to 15 eV, when the argon pressure increased from 0.08 to 2 Pa, which is caused by a decrease of the electron temperature also by a factor of 2. Indium atoms exhibit higher mean energies due to their additional energy from the sputtering process. The total metal ion flux turns out to be proportional to the discharge power and the pressure, the latter dependence being due to Penning ionization of the metal atoms (In and Sn). From the scans across the target surface the lateral distributions of metal, oxygen, and argon ions were derived. In the dc discharge the position of the erosion track is reproduced by increased ion intensities, while it is not the case for the rf excited plasma. The lateral variations of the observed species do not influence the lateral resistivity distributions of the deposited ITO films

  4. Electrical properties of AlN{sub x}O{sub y} thin films prepared by reactive magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Borges, J., E-mail: joelborges@fisica.uminho.pt [Centro de Fisica, Universidade do Minho, 4710-057 Braga (Portugal); Martin, N. [Institut FEMTO-ST, Departement MN2S, UMR 6174 (CNRS, UFC, ENSMM, UTBM) 32, Avenue de l' Observatoire 25044 BESANCON Cedex (France); Barradas, N.P.; Alves, E. [Instituto Superior Tecnico, Instituto Tecnologico Nuclear, E.N. 10, 2686-953 Sacavem (Portugal); Eyidi, D.; Beaufort, M.F.; Riviere, J.P. [Institut PPRIME, UPR 3346 CNRS-Universite de Poitiers-ENSMA, Departement de Physique et Mecanique des Materiaux, BP 30179 86962 Chasseneuil-Futuroscope Cedex (France); Vaz, F.; Marques, L. [Centro de Fisica, Universidade do Minho, 4710-057 Braga (Portugal)

    2012-08-31

    Direct current magnetron sputtering was used to produce AlN{sub x}O{sub y} thin films, using an aluminum target, argon and a mixture of N{sub 2} + O{sub 2} (17:3) as reactive gases. The partial pressure of the reactive gas mixture was increased, maintaining the discharge current constant. Within the two identified regimes of the target (metallic and compound), four different tendencies for the deposition rate were found and a morphological evolution from columnar towards cauliflower-type, ending up as dense and featureless-type films. The structure was found to be Al-type (face centered cubic) and the structural characterization carried out by X-ray diffraction and transmission electron microscopy suggested the formation of an aluminum-based polycrystalline phase dispersed in an amorphous aluminum oxide/nitride (or oxynitride) matrix. This type of structure, composition, morphology and grain size, were found to be strongly correlated with the electrical response of the films, which showed a gradual transition between metallic-like responses towards semiconducting and even insulating-type behaviors. A group of films with high aluminum content revealed a sharp decrease of the temperature coefficient of resistance (TCR) as the concentration ratio of non-metallic/aluminum atomic ratio increased. Another group of samples, where the non-metallic content became more important, revealed a smooth transition between positive and negative values of TCR. In order to test whether the oxynitride films have a unique behavior or simply a transition between the typical responses of aluminum and of those of the correspondent nitride and oxide, the electrical properties of the ternary oxynitride system were compared with AlN{sub x} and AlO{sub y} systems, prepared in similar conditions. - Highlights: Black-Right-Pointing-Pointer AlN{sub x}O{sub y} thin films were produced using magnetron sputtering. Black-Right-Pointing-Pointer AlN{sub x}O{sub y} film morphology, composition and

  5. Theoretical Analysis of Potential and Current Distributions in Planar Electrodes of Lithium-ion Batteries

    International Nuclear Information System (INIS)

    Taheri, Peyman; Mansouri, Abraham; Yazdanpour, Maryam; Bahrami, Majid

    2014-01-01

    An analytical model is proposed to describe the two-dimensional distribution of potential and current in planar electrodes of pouch-type lithium-ion batteries. A concentration-independent polarization expression, obtained experimentally, is used to mimic the electrochemical performance of the battery. By numerically solving the charge balance equation on each electrode in conjugation with the polarization expression, the battery behavior during constant-current discharge processes is simulated. Our numerical simulations show that reaction current between the electrodes remains approximately uniform during most of the discharge process, in particular, when depth-of-discharge varies from 5% to 85%. This observation suggests to simplify the electrochemical behavior of the battery such that the charge balance equation on each electrode can be solved analytically to obtain closed-form solutions for potential and current density distributions. The analytical model shows fair agreement with numerical data at modest computational cost. The model is applicable for both charge and discharge processes, and its application is demonstrated for a prismatic 20 Ah nickel-manganese-cobalt lithium-ion battery during discharge processes

  6. PVD processes of thin films deposition using Hall-current discharge

    International Nuclear Information System (INIS)

    Svadkovskij, I.V.

    2007-01-01

    Results of research and developments in the field of PVD processes of thin films deposition using Hall-current discharge have been summarized. Effects of interaction of ions with surface during deposition have been considered. Also features of application and prospects of devices based on ion beam and magnetron sputtering systems in thin films technologies have been analyzed. The aspects in the field plasma physics, technology and equipment plasma PVD processes of thin films deposition have been systematized, on the base of investigations made by author and other scientists. (authors)

  7. Glow discharging device

    International Nuclear Information System (INIS)

    Maeno, Katsuki; Kawasaki, Kozo; Hiratsuka, Hajime; Kawashima, Shuichi.

    1989-01-01

    In a thermonuclear device, etc. impurities adsorbed to inner walls of a vacuum vessel by glow discharge are released to clean the vacuum vessel for preventing intrusion of the impurities into plasmas. The object of the present invention is to minimize the capacity of a power source equipment for the glow discharge device to the least extent. That is, a stabilization resistance is connected in series between each of a plurality of anodes which are inserted and arranged at the inside of a vacuum vessel as a cathode and a power source respectively. The resistance value R is selected so as to satisfy the relation: R < (Vi - Vm)/Ii, in which Vi: glow discharge starting voltage, Vm: glow discharge keeping voltage, Ii: glow discharge starting current. Accordingly, if a voltage is applied from a power source to a plurality of anodes, scattering of electric discharge between the anodes can be suppressed and the effect of voltage drop during discharge by the stabilization resistance can be eliminated. As a result, it is possible to provide an economically advantageous glow discharge device with the capacity for the power source facility being to the least extent. (K.M.)

  8. Planar Poincare chart - A planar graphic representation of the state of light polarization

    Science.gov (United States)

    Tedjojuwono, Ken K.; Hunter, William W., Jr.; Ocheltree, Stewart L.

    1989-01-01

    The planar Poincare chart, which represents the complete planar equivalence of the Poincare sphere, is proposed. The four sets of basic lines are drawn on two separate charts for the generalization and convenience of reading the scale. The chart indicates the rotation of the principal axes of linear birefringent material. The relationships between parameters of the two charts are given as 2xi-2phi (orientation angle of the major axis-ellipticity angle) pair and 2alpha-delta (angle of amplitude ratio-phase difference angle) pair. The results are useful for designing and analyzing polarization properties of optical components with birefringent properties.

  9. CO-AXIAL DISCHARGES

    Science.gov (United States)

    Luce, J.S.; Smith, L.P.

    1960-11-22

    A method and apparatus are given for producing coaxial arc discharges in an evacuated enclosure and within a strong, confining magnetic field. The arcs are maintained at a high potential difference. Electrons will diffuse to the more positive arc from the negative arc, and positive ions will diffuse from the more positive arc to the negative arc. Coaxial arc discharges have the advantage that ions which return to strike the positive arc discharge will lose no energy since they do not strike a solid wall or electrode. Those discharges are useful in confining an ionized plasma between the discharges, and have the advantage of preventing impurities from the walls of the enclosure from entering ihe plasma area because of the arc barrier set up bv the cylindrical outer arc.

  10. Modelling electric discharge chemistry

    International Nuclear Information System (INIS)

    McFarlane, J.; Wren, J.C.

    1991-07-01

    The chemistry occurring in a electric discharge was modelled to predict how it would be influenced by discharge conditions. The discharge was characterized by a calculated Boltzmann electron-energy distribution, from which rate constants for electron-molecule processes in air were determined. These rate constants were used in a chemical kinetics calculation that also included reactions between neutral molecules, ions, free radicals and electronically excited species. The model describes how the discharge chemistry was influenced by humidity, electric field, electron number density, and concentrations of key reagents identified in the study. The use of an electric discharge to destroy airborne contaminant molecules was appraised, the targeted contaminants being CF 2 Cl 2 , HCN, and SO 2 . The modelling results indicate that an electric discharge should be able to remove HCN and CF 2 Cl 2 effectively, especially if the discharge conditions have been optimized. Effective destruction is achieved with a moderate electric field (over 1 x 10 -15 V.cm 2 ), a substantial electron number density (over 1 x 10 12 cm -3 ), and the presence of H 2 0 in the process air. The residence time in the discharge was also shown to be important in contaminant destruction. An attempt was made to explain the results of the electric discharge abatement of SO 2 , a component of a simulated flue-gas mixture. Results from the model indicate that the discharge parameters that increase the concentration of hydroxyl radical also increase the rate of decomposition of SO 2 . An objective of the study was to explain the apparent enhancement of SO 2 destruction by the presence of a small amount of NO 2 . It was thought that a likely explanation would be the stabilization of HOSO 2 , an important intermediate in the oxidation of SO 2 by NO 2 . (49 figs., 14 tabs., 75 refs.)

  11. CrN/AlN nanolaminate coatings deposited via high power pulsed and middle frequency pulsed magnetron sputtering

    International Nuclear Information System (INIS)

    Bagcivan, N.; Bobzin, K.; Ludwig, A.; Grochla, D.; Brugnara, R.H.

    2014-01-01

    Nanolaminate coatings based on transition metal nitrides such as CrN, AlN and TiN deposited via physical vapor deposition (PVD) have shown great advantage as protective coatings on tools and components subject to high loads in tribological applications. By varying the individual layer materials and their thicknesses it is possible to optimize the coating properties, e.g. hardness, Young's modulus and thermal stability. One way for further improvement of coating properties is the use of advanced PVD technologies. High power pulsed magnetron sputtering (HPPMS) is an advancement of pulsed magnetron sputtering (MS). The use of HPPMS allows a better control of the energetic bombardment of the substrate due to the higher ionization degree of metallic species. It provides an opportunity to influence chemical and mechanical properties by varying the process parameters. The present work deals with the development of CrN/AlN nanolaminate coatings in an industrial scale unit by using two different PVD technologies. Therefore, HPPMS and mfMS (middle frequency magnetron sputtering) technologies were used. The bilayer period Λ, i.e. the thickness of a CrN/AlN double layer, was varied between 6.2 nm and 47.8 nm by varying the rotational speed of the substrate holders. In a second step the highest rotational speed was chosen and further HPPMS CrN/AlN coatings were deposited applying different HPPMS pulse lengths (40, 80, 200 μs) at the same mean cathode power and frequency. Thickness, morphology, roughness and phase composition of the coatings were analyzed by means of scanning electron microscopy (SEM), confocal laser microscopy, and X-ray diffraction (XRD), respectively. The chemical composition was determined using glow discharge optical emission spectroscopy (GDOES). Detailed characterization of the nanolaminate was conducted by transmission electron microscopy (TEM). The hardness and the Young's modulus were analyzed by nanoindentation measurements. The residual

  12. Structure and phase composition of the titanium dioxide thin films deposited on the surface of the metallized track membranes from polyethyleneterephthalate by reactive magnetron sputtering

    International Nuclear Information System (INIS)

    Artoshina, O.V.; Semina, V.K.; Kochnev, Yu.K.; Nechaev, A.N.; Apel', P.Yu.; Milovich, F.O.; Iskhakova, L.D.; Ermakov, R.P.; Rossouw, A.; Gorberg, B.L.

    2016-01-01

    Thin films of TiO 2 , Ag, Ag-TiO 2 , Cu-TiO 2 deposited on the surface of polyethyleneterephthalate track membranes (TM) were investigated. Metals and oxide deposition was carried out by the method of vacuum reactive sputtering with application of a planar magnetron. The microstructure of samples was studied by the scanning and transmission electron microscopy (TEM) techniques. The elemental composition of coatings was investigated using energy-dispersive spectroscopy. For the identification of phase structure, X-ray diffraction phase analysis was used at various temperatures, and the XRD crystal structure patterns of the samples were obtained by the selected area electron diffraction (SAED) in TEM analysis. It was found that titanium dioxide on the TM surface can be present in three forms: nanocrystals of tetragonal anatase with impurity of rhombic brookite and the so-called X-ray amorphous TiO 2 . Cubical Cu 2 O was identified in TM metallized by copper. Optical properties of composite membranes and films were investigated by the method of absorption spectroscopy. Calculation of energies of the direct and indirect allowed optical transitions was carried out based on the analysis of absorption spectra of the studied composite membranes. [ru

  13. Effect of N Concentration on Microstructure Evolution of the Nanostructured (Al, Ti, SiN Coatings Prepared by d.c. Reactive Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    L. Jakab-Farkas

    2009-12-01

    Full Text Available Nanostructured (Al, Ti, SiN thin film coatings were synthesized by d.c. reactive magnetron sputtering, performed in an Ar/N2 gas mixture from a planar rectangular Al:Ti:Si=50:25:25 alloyed target. The mass flow of N2 reactive gas was strictly controlled in sputtering process. Conventional transmission electron microscopy (TEM technique was used for microstructure investigation of the as deposited films. Cross-sectional cuts performed through the deposited films revealed distinct microstructure evolution for different samples. It was found that the variation of the reactive gas amount induced changes in film microstructure. The metallic AlTiSi film exhibited strong columnar growth with a crystalline structure. The addition of a small amount of nitrogen to the process gas leads to a crystallite refinement. Further increase of N concentration resulted in evolution of fine lamellae growth morphology consisting of hainlike pearls in a dendrite, clusters of very fine grains in close crystallographic orientation.

  14. Properties of RF magnetron sputtered gallium nitride semiconductors doped with erbium

    Czech Academy of Sciences Publication Activity Database

    Peřina, Vratislav; Macková, Anna; Hnatowicz, Vladimír; Prajzler, V.; Machovič, V.; Matějka, P.; Schröfel, J.

    2004-01-01

    Roč. 36, č. 8 (2004), s. 952-954 ISSN 0142-2421 R&D Projects: GA ČR GA104/03/0387 Institutional research plan: CEZ:AV0Z1048901 Keywords : Er-doped GaN * luminescence * magnetron sputtering Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders Impact factor: 1.209, year: 2004

  15. High frequency pulse anodising of magnetron sputtered Al–Zr and Al–Ti Coatings

    DEFF Research Database (Denmark)

    Gudla, Visweswara Chakravarthy; Bordo, Kirill; Engberg, Sara

    2016-01-01

    High frequency pulse anodising of Al–Zr and Al–Ti coatings is studied as a surface finishing technique and compared to conventional decorative DC anodising. The Al–Zr and Al–Ti coatings were deposited using DC magnetron sputtering and were heat treated after deposition to generate a multiphase mi...

  16. Structure of AlN films deposited by magnetron sputtering method

    Directory of Open Access Journals (Sweden)

    Nowakowska-Langier K.

    2015-09-01

    Full Text Available AlN films on a Si substrate were synthesized by magnetron sputtering method. A dual magnetron system operating in AC mode was used in the experiment. Processes of synthesis were carried out in the atmosphere of a mixture of Ar/N2. Morphology and phase structure of the AlN films were investigated at different pressures. Structural characterizations were performed by means of SEM and X-ray diffraction methods. Our results show that the use of magnetron sputtering method in a dual magnetron sputtering system is an effective way to produce AlN layers which are characterized by a good adhesion to the silicon substrate. The morphology of the films is strongly dependent on the Ar/N2 gas mixture pressure. An increase of the mixture pressure is accompanied by a columnar growth of the layers. The films obtained at the pressure below 1 Pa are characterized by finer and compacter structure. The AlN films are characterized by a polycrystalline hexagonal (wurtzite structure in which the crystallographic orientation depends on the gas mixture pressure.

  17. A comparison of plasma in laser and hybrid laser-magnetron SiC deposition systems

    Czech Academy of Sciences Publication Activity Database

    Novotný, Michal; Bulíř, Jiří; Lančok, Ján; Jelínek, Miroslav

    2007-01-01

    Roč. 4, - (2007), S1017-S1021 ISSN 1612-8850 R&D Projects: GA AV ČR KJB1010417; GA ČR GA202/06/0216 Institutional research plan: CEZ:AV0Z10100522 Keywords : laser ablation * magnetron sputtering * optical emission spectroscopy Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 2.132, year: 2007

  18. Polyester fabric coated with Ag/ZnO composite film by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Yuan, Xiaohong, E-mail: yxhong1981_2004@126.com [Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu (China); Faculty of Clothing and Design, Minjiang University, Fuzhou 350121, Fujian (China); Xu, Wenzheng, E-mail: xwz8199@126.com [Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu (China); Huang, Fenglin, E-mail: windhuang325@163.com [Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu (China); Chen, Dongsheng, E-mail: mjuchen@126.com [Faculty of Clothing and Design, Minjiang University, Fuzhou 350121, Fujian (China); Wei, Qufu, E-mail: qfwei@jiangnan.edu.cn [Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu (China)

    2016-12-30

    Highlights: • Ag/ZnO composite film was successfully deposited on polyester fabric by magnetron sputtering technique. • Ag film was easily oxidized into Ag{sub 2}O film in high vacuum oxygen environment. • The zinc film coated on the surface of Ag film before RF reactive sputtering could protect the silver film from oxidation. • Polyester fabric coated with Ag/ZnO composite film can obtained structural color. • The anti-ultraviolet and antistatic properties of polyester fabric coated with Ag/ZnO composite film all were good. - Abstract: Ag/ZnO composite film was successfully deposited on polyester fabric by using direct current (DC) magnetron sputtering and radio frequency (RF) magnetron reaction sputtering techniques with pure silver (Ag) and zinc (Zn) targets. X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were used to examine the deposited film on the fabric. It was found that the zinc film coated on Ag film before RF reactive sputtering could protect the silver film from oxidation. Anti-ultraviolet property and antistatic property of the coated samples using different magnetron sputtering methods were also investigated. The experimental results showed that Ag film was oxidized into in Ag{sub 2}O film in high vacuum oxygen environment. The deposition of Zn film on the surface of the fabric coated with Ag film before RF reactive sputtering, could successfully obtained Ag/ZnO composite film, and also generated structural color on the polyester fabric.

  19. Magnetron sputtered gadolinia-doped ceria diffusion barriers for metal-supported solid oxide fuel cells

    DEFF Research Database (Denmark)

    Sønderby, Steffen; Klemensø, Trine; Christensen, Bjarke H.

    2014-01-01

    Gadolinia-doped ceria (GDC) thin films are deposited by reactive magnetron sputtering in an industrial-scale setup and implemented as barrier layers between the cathode and electrolyte in metal-based solid oxide fuel cells consisting of a metal support, an electrolyte of ZrO2 co-doped with Sc2O3...

  20. Interfacial Structure and Photocatalytic Activity of Magnetron Sputtered TiO2 on Conducting Metal Substrates

    DEFF Research Database (Denmark)

    Daviðsdóttir, Svava; Petit, Jean-Pierre; Mermoux, Michel

    2014-01-01

    The photocatalytic behavior of magnetron sputtered anatase TiO2 coatings on copper, nickel, and gold was investigated with the aim of understanding the effect of the metallic substrate and coating-substrate interface structure. Stoichiometry and nanoscale structure of the coating were investigated...

  1. High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Lisco, F., E-mail: F.Lisco@lboro.ac.uk [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom); Kaminski, P.M.; Abbas, A.; Bowers, J.W.; Claudio, G. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom); Losurdo, M. [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari (Italy); Walls, J.M. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom)

    2015-01-01

    Cadmium Sulphide (CdS) is an important n-type semiconductor widely used as a window layer in thin film photovoltaics Copper Indium Selenide, Copper Indium Gallium (di)Selenide, Copper Zinc Tin Sulphide and Cadmium Telluride (CdTe). Cadmium Sulphide has been deposited using a number of techniques but these techniques can be slow (chemical bath deposition and Radio Frequency sputtering) or the uniformity and the control of thickness can be relatively difficult (close space sublimation). In this paper we report on the development of a process using pulsed Direct Current magnetron sputtering which allows nanometre control of thin film thickness using time only. The CdS thin films deposited in this process are highly uniform and smooth. They exhibit the preferred hexagonal structure at room temperature deposition and they have excellent optical properties. Importantly, the process is highly stable despite the use of a semi-insulating magnetron target. Moreover, the process is very fast. The deposition rate using 1.5 kW of power to a 6-inch circular magnetron was measured to be greater than 8 nm/s. This makes the process suitable for industrial deployment. - Highlights: • Pulsed DC magnetron sputtering of CdS • High deposition rate deposition • Uniform, pinhole free films.

  2. Advanced TiC/a-C : H nanocomposite coatings deposited by magnetron sputtering

    NARCIS (Netherlands)

    Pei, Y.T.; Galvan, D.; Hosson, J.Th.M. De; Strondl, C.

    2006-01-01

    TiC/a-C:H nanocomposite coatings have been deposited by magnetron Sputtering. They consist of 2-5 nm TiC nanocrystallites embedded in the amorphous hydrocarbon (a-C:H) matrix. A transition from a Columnar to a glassy microstructure has been observed in the nanocomposite coatings with increasing

  3. Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

    NARCIS (Netherlands)

    Rafieian Boroujeni, Damon; Ogieglo, Wojciech; Savenije, Tom; Lammertink, Rob G.H.

    2015-01-01

    We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to

  4. Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

    OpenAIRE

    Rafieian Boroujeni, Damon; Ogieglo, Wojciech; Savenije, Tom; Lammertink, Rob G.H.

    2015-01-01

    We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to anatase or rutile, depending on the initial sputtering conditions. Substoichiometric films (TiOx

  5. Magnetic field effects on coating deposition rate and surface morphology coatings using magnetron sputtering

    International Nuclear Information System (INIS)

    Yang, Yu-Sen; Huang, Wesley

    2010-01-01

    Chromium nitride coatings exhibit superior hardness, excellent wear and oxidation resistance, and are widely applied in the die and mold industries. The aim of this study was to investigate magnetic field effects on the deposition rate and surface morphology of chromium nitride coatings deposited by magnetron sputtering. Four types of magnetic field configurations, including the magnetron sputtering system, SNSN, SNNN, and intermediate magnetron modification, are discussed in this paper. SKD11 cold work die steel and a silicon (100) chip were used as substrates in the chromium nitride depositions. The process parameters, such as target current, substrate bias, and the distance between the substrate and target, are at fixed conditions, except for the magnetic arrangement type. The experimental results showed that the deposition rates of the four types of magnetic field configurations were 1.06, 1.38, 1.67 and 1.26 µm h −1 , respectively. In these cases, the SNNN type performs more than 58% faster than the unbalanced magnetron configuration does for the deposition rate. The surface morphology of chromium nitride films was also examined by SEM and is discussed in this paper

  6. A novel DC Magnetron sputtering facility for space research and synchrotron radiation optics

    DEFF Research Database (Denmark)

    Hussain, A.M.; Christensen, Finn Erland; Pareschi, G.

    1998-01-01

    A new DC magnetron sputtering facility has been build up at the Danish Space Research Institute (DSRI), specially designed to enable uniform coatings of large area curved optics, such as Wolter-I mirror optics used in space telescopes and curved optics used in synchrotron radiation facilities...

  7. Growth behavior of rat bone marrow cells on RF magnetron sputtered hydroxyapatite and dicalcium pyrophosphate coatings.

    NARCIS (Netherlands)

    Yan, Y.; Wolke, J.G.C.; Ruijter, A. De; Yubao, L.; Jansen, J.A.

    2006-01-01

    The aim of this study was to evaluate the osteogenic properties of magnetron sputtered dicalcium pyrophaosphate (DCPP) and hydroxylapatite (HA) coatings. Therefore, DCPP and HA coatings were deposited on grit-blasted titanium discs. The substrates were used as-prepared or received an additional heat

  8. High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering

    International Nuclear Information System (INIS)

    Lisco, F.; Kaminski, P.M.; Abbas, A.; Bowers, J.W.; Claudio, G.; Losurdo, M.; Walls, J.M.

    2015-01-01

    Cadmium Sulphide (CdS) is an important n-type semiconductor widely used as a window layer in thin film photovoltaics Copper Indium Selenide, Copper Indium Gallium (di)Selenide, Copper Zinc Tin Sulphide and Cadmium Telluride (CdTe). Cadmium Sulphide has been deposited using a number of techniques but these techniques can be slow (chemical bath deposition and Radio Frequency sputtering) or the uniformity and the control of thickness can be relatively difficult (close space sublimation). In this paper we report on the development of a process using pulsed Direct Current magnetron sputtering which allows nanometre control of thin film thickness using time only. The CdS thin films deposited in this process are highly uniform and smooth. They exhibit the preferred hexagonal structure at room temperature deposition and they have excellent optical properties. Importantly, the process is highly stable despite the use of a semi-insulating magnetron target. Moreover, the process is very fast. The deposition rate using 1.5 kW of power to a 6-inch circular magnetron was measured to be greater than 8 nm/s. This makes the process suitable for industrial deployment. - Highlights: • Pulsed DC magnetron sputtering of CdS • High deposition rate deposition • Uniform, pinhole free films

  9. Low-pressure glow discharges with oscillating electrons in different electrode systems

    International Nuclear Information System (INIS)

    Bersenev, V.V.; Gavriolv, N.V.; Nikulin, S.P.

    1995-01-01

    One of the main applications of low - pressure glow discharges is the development on their basis of charged - particle beam sources. The use of glow discharges with oscillating electrons, which can operate stably in the voltage and pressure range to the left of the left branch of Pashen's curve, shows promise, because the decrease in critical pressure p 0 , below which the discharge operation becomes impossible, in the discharge system of a source promotes an increase in the electrical strength of its accelerating system. This, in its turn, makes possible the expansion of the operation range of accelerating voltages. This experimental investigation of glow discharges in such well - known systems with oscillating electrons, as Hollow Cathode (HC), Penning's System (PS) and Inverse Magnetron (IM), is aimed at revealing the system operating at the lowest pressure. Besides, both common features and peculiarities of discharge operation in these systems are discussed. Though there is an extensive amount of published information covering all the specified discharges, the carrying out of such investigation is justified, since a comparative analysis of results obtained by different authors is hampered by various conditions of their experiments

  10. High-power planar dielectric waveguide lasers

    International Nuclear Information System (INIS)

    Shepherd, D.P.; Hettrick, S.J.; Li, C.; Mackenzie, J.I.; Beach, R.J.; Mitchell, S.C.; Meissner, H.E.

    2001-01-01

    The advantages and potential hazards of using a planar waveguide as the host in a high-power diode-pumped laser system are described. The techniques discussed include the use of proximity-coupled diodes, double-clad waveguides, unstable resonators, tapers, and integrated passive Q switches. Laser devices are described based on Yb 3+ -, Nd 3+ -, and Tm 3+ -doped YAG, and monolithic and highly compact waveguide lasers with outputs greater than 10 W are demonstrated. The prospects for scaling to the 100 W level and for further integration of devices for added functionality in a monolithic laser system are discussed. (author)

  11. Planar permanent magnet multipoles: Measurements and configurations

    International Nuclear Information System (INIS)

    Cremer, T.; Tatchyn, R.

    1995-05-01

    Biplanar arrays of N rectangular permanent magnet (PM) blocks can be used to generate high quality N-pole fields in close proximity to the array axis. In applications featuring small-diameter charged particle beams, N-poles of adequate quality can be realized at relatively low cost using small volumes of PM material. In this paper we report on recent measurements performed on planar PM multipoles, and discuss techniques for improving the field quality of such devices at distances appreciably far away from the axis. Applications to hybrid/PM insertion device designs for linac-driven Free Electron Laser (FEL) operation in the x-ray range are described

  12. Broadband Planar 5:1 Impedence Transformer

    Science.gov (United States)

    Ehsan, Negar; Hsieh, Wen-Ting; Moseley, Samuel H.; Wollack, Edward J.

    2015-01-01

    This paper presents a broadband Guanella-type planar impedance transformer that transforms so 50 omega to 10 omega with a 10 dB bandwidth of 1-14GHz. The transformer is designed on a flexible 50 micrometer thick polyimide substrate in microstrip and parallel-plate transmission line topologies, and is Inspired by the traditional 4:1 Guanella transformer. Back-to-back transformers were designed and fabricated for characterization in a 50 omega system. Simulated and measured results are in excellent agreement.

  13. Development of planar waveguides in zinc telluride

    International Nuclear Information System (INIS)

    Valette, Serge

    1977-02-01

    Zinc telluride (ZnTe) is one of the most attractive semi-conductors for monolithic integrated optics. In this study, the general characteristics of the planar optical waveguides achieved by implantation of light ions in ZnTe are investigated. Different aspects of prism-coupling and coherent light guiding have been taken up theoretically and experimentally. Some assumptions about the physical origin of these structures are discussed in order to explain all these results and the weak losses which have been measured. [fr

  14. Spatially hybrid computations for streamer discharges with generic features of pulled fronts: I. Planar fronts

    NARCIS (Netherlands)

    C. Li (Chao); U. M. Ebert (Ute); W. Hundsdorfer (Willem)

    2010-01-01

    textabstractStreamers are the first stage of sparks and lightning; they grow due to a strongly enhanced electric field at their tips: this field is created by a thin curved space charge layer. These multiple scales are already challenging when the electrons are approximated by densities. However,

  15. Discharge lamp technologies

    Science.gov (United States)

    Dakin, James

    1994-01-01

    This talk is an overview of discharge lamp technology commonly employed in general lighting, with emphasis on issues pertinent to lighting for plant growth. Since the audience is primarily from the plant growth community, and this begins the light source part of the program, we will start with a brief description of the discharge lamps. Challenges of economics and of thermal management make lamp efficiency a prime concern in controlled environment agriculture, so we will emphasize science considerations relating to discharge lamp efficiency. We will then look at the spectra and ratings of some representative lighting products, and conclude with a discussion of technological advances.

  16. Capacitor discharge engineering

    CERN Document Server

    Früngel, Frank B A

    1976-01-01

    High Speed Pulse Technology, Volume III: Capacitor Discharge Engineering covers the production and practical application of capacitor dischargers for the generation and utilization of high speed pulsed of energy in different forms. This nine-chapter volume discusses the principles of electric current, voltage, X-rays, gamma rays, heat, beams of electrons, neutrons and ions, magnetic fields, sound, and shock waves in gases and liquids. Considerable chapters consider the applications of capacitor discharges, such as impulse hardening of steel, ultrapulse welding of precision parts, X-ray flash t

  17. Predicting tile drainage discharge

    DEFF Research Database (Denmark)

    Iversen, Bo Vangsø; Kjærgaard, Charlotte; Petersen, Rasmus Jes

    used in the analysis. For the dynamic modelling, a simple linear reservoir model was used where different outlets in the model represented tile drain as well as groundwater discharge outputs. This modelling was based on daily measured tile drain discharge values. The statistical predictive model...... was based on a polynomial regression predicting yearly tile drain discharge values using site specific parameters such as soil type, catchment topography, etc. as predictors. Values of calibrated model parameters from the dynamic modelling were compared to the same site specific parameter as used...

  18. Some remarks on non-planar Feynman diagrams

    International Nuclear Information System (INIS)

    Bielas, Krzysztof; Dubovyk, Ievgen; Gluza, Janusz

    2013-12-01

    Two criteria for planarity of a Feynman diagram upon its propagators (momentum ows) are presented. Instructive Mathematica programs that solve the problem and examples are provided. A simple geometric argument is used to show that while one can planarize non-planar graphs by embedding them on higher-genus surfaces (in the example it is a torus), there is still a problem with defining appropriate dual variables since the corresponding faces of the graph are absorbed by torus generators.

  19. Some remarks on non-planar Feynman diagrams

    Energy Technology Data Exchange (ETDEWEB)

    Bielas, Krzysztof; Dubovyk, Ievgen; Gluza, Janusz [Silesia Univ., Katowice (Poland). Inst. of Physics; Riemann, Tord [Deutsches Elektronen-Synchrotron (DESY), Zeuthen (Germany)

    2013-12-15

    Two criteria for planarity of a Feynman diagram upon its propagators (momentum ows) are presented. Instructive Mathematica programs that solve the problem and examples are provided. A simple geometric argument is used to show that while one can planarize non-planar graphs by embedding them on higher-genus surfaces (in the example it is a torus), there is still a problem with defining appropriate dual variables since the corresponding faces of the graph are absorbed by torus generators.

  20. Electromagnetic surface waves for large-area RF plasma productions between large-area planar electrodes

    International Nuclear Information System (INIS)

    Nonaka, S.

    1992-01-01

    Recently, large-area plasma production has been tested by means of a 13.56 MHz radio-frequency (RF) discharge between a pair of large-area planar electrodes, approximately 0.5 m x 1.4 m, as one of the semiconductor technologies for fabrication of large-area amorphous silicon solar cells in the ''Sunshine Project'' of the Agency of Industrial Science and Technology in Japan. We also confirmed long plasma production between a pair of long electrodes. In this paper, normal electromagnetic (EM) waves propagating in a region between a planar waveguide with one plasma and two dielectric layers are analyzed in order to study the feasibility of large-area plasma productions by EM wave-discharges between a pair of large-area RF electrodes larger than the half-wavelength of RF wave. In conclusion, plasmas higher than an electron plasma frequency will be produced by an odd TMoo surface mode. (author) 4 refs., 3 figs

  1. Multistability in planar liquid crystal wells

    KAUST Repository

    Luo, Chong; Majumdar, Apala; Erban, Radek

    2012-01-01

    A planar bistable liquid crystal device, reported in Tsakonas, is modeled within the Landau-de Gennes theory for nematic liquid crystals. This planar device consists of an array of square micrometer-sized wells. We obtain six different classes of equilibrium profiles and these profiles are classified as diagonal or rotated solutions. In the strong anchoring case, we propose a Dirichlet boundary condition that mimics the experimentally imposed tangent boundary conditions. In the weak anchoring case, we present a suitable surface energy and study the multiplicity of solutions as a function of the anchoring strength. We find that diagonal solutions exist for all values of the anchoring strength W≥0, while rotated solutions only exist for W≥W c>0, where W c is a critical anchoring strength that has been computed numerically. We propose a dynamic model for the switching mechanisms based on only dielectric effects. For sufficiently strong external electric fields, we numerically demonstrate diagonal-to-rotated and rotated-to-diagonal switching by allowing for variable anchoring strength across the domain boundary. © 2012 American Physical Society.

  2. Multistability in planar liquid crystal wells

    KAUST Repository

    Luo, Chong

    2012-06-08

    A planar bistable liquid crystal device, reported in Tsakonas, is modeled within the Landau-de Gennes theory for nematic liquid crystals. This planar device consists of an array of square micrometer-sized wells. We obtain six different classes of equilibrium profiles and these profiles are classified as diagonal or rotated solutions. In the strong anchoring case, we propose a Dirichlet boundary condition that mimics the experimentally imposed tangent boundary conditions. In the weak anchoring case, we present a suitable surface energy and study the multiplicity of solutions as a function of the anchoring strength. We find that diagonal solutions exist for all values of the anchoring strength W≥0, while rotated solutions only exist for W≥W c>0, where W c is a critical anchoring strength that has been computed numerically. We propose a dynamic model for the switching mechanisms based on only dielectric effects. For sufficiently strong external electric fields, we numerically demonstrate diagonal-to-rotated and rotated-to-diagonal switching by allowing for variable anchoring strength across the domain boundary. © 2012 American Physical Society.

  3. Motion video analysis using planar parallax

    Science.gov (United States)

    Sawhney, Harpreet S.

    1994-04-01

    Motion and structure analysis in video sequences can lead to efficient descriptions of objects and their motions. Interesting events in videos can be detected using such an analysis--for instance independent object motion when the camera itself is moving, figure-ground segregation based on the saliency of a structure compared to its surroundings. In this paper we present a method for 3D motion and structure analysis that uses a planar surface in the environment as a reference coordinate system to describe a video sequence. The motion in the video sequence is described as the motion of the reference plane, and the parallax motion of all the non-planar components of the scene. It is shown how this method simplifies the otherwise hard general 3D motion analysis problem. In addition, a natural coordinate system in the environment is used to describe the scene which can simplify motion based segmentation. This work is a part of an ongoing effort in our group towards video annotation and analysis for indexing and retrieval. Results from a demonstration system being developed are presented.

  4. Planar patch clamp: advances in electrophysiology.

    Science.gov (United States)

    Brüggemann, Andrea; Farre, Cecilia; Haarmann, Claudia; Haythornthwaite, Ali; Kreir, Mohamed; Stoelzle, Sonja; George, Michael; Fertig, Niels

    2008-01-01

    Ion channels have gained increased interest as therapeutic targets over recent years, since a growing number of human and animal diseases have been attributed to defects in ion channel function. Potassium channels are the largest and most diverse family of ion channels. Pharmaceutical agents such as Glibenclamide, an inhibitor of K(ATP) channel activity which promotes insulin release, have been successfully sold on the market for many years. So far, only a small group of the known ion channels have been addressed as potential drug targets. The functional testing of drugs on these ion channels has always been the bottleneck in the development of these types of pharmaceutical compounds.New generations of automated patch clamp screening platforms allow a higher throughput for drug testing and widen this bottleneck. Due to their planar chip design not only is a higher throughput achieved, but new applications have also become possible. One of the advantages of planar patch clamp is the possibility of perfusing the intracellular side of the membrane during a patch clamp experiment in the whole-cell configuration. Furthermore, the extracellular membrane remains accessible for compound application during the experiment.Internal perfusion can be used not only for patch clamp experiments with cell membranes, but also for those with artificial lipid bilayers. In this chapter we describe how internal perfusion can be applied to potassium channels expressed in Jurkat cells, and to Gramicidin channels reconstituted in a lipid bilayer.

  5. Optical magnetism in planar metamaterial heterostructures.

    Science.gov (United States)

    Papadakis, Georgia T; Fleischman, Dagny; Davoyan, Artur; Yeh, Pochi; Atwater, Harry A

    2018-01-18

    Harnessing artificial optical magnetism has previously required complex two- and three-dimensional structures, such as nanoparticle arrays and split-ring metamaterials. By contrast, planar structures, and in particular dielectric/metal multilayer metamaterials, have been generally considered non-magnetic. Although the hyperbolic and plasmonic properties of these systems have been extensively investigated, their assumed non-magnetic response limits their performance to transverse magnetic (TM) polarization. We propose and experimentally validate a mechanism for artificial magnetism in planar multilayer metamaterials. We also demonstrate that the magnetic properties of high-index dielectric/metal hyperbolic metamaterials can be anisotropic, leading to magnetic hyperbolic dispersion in certain frequency regimes. We show that such systems can support transverse electric polarized interface-bound waves, analogous to their TM counterparts, surface plasmon polaritons. Our results open a route for tailoring optical artificial magnetism in lithography-free layered systems and enable us to generalize the plasmonic and hyperbolic properties to encompass both linear polarizations.

  6. Overview of Planar Magnetic Technology — Fundamental Properties

    DEFF Research Database (Denmark)

    Ouyang, Ziwei; Andersen, Michael A. E.

    2014-01-01

    The momentum towards high efficiency, high frequency, and high power density in power supplies limits wide use of conventional wire-wound magnetic components. This article gives an overview of planar magnetic technologies with respect to the development of modern power electronics. The major...... advantages and disadvantages in the use of planar magnetics for high frequency power converters are covered, and publications on planar magnetics are reviewed. A detailed survey of winding conduction loss, leakage inductance and winding capacitance for planar magnetics is presented so power electronics...

  7. Guidelines for optimization of planar HDR implants

    International Nuclear Information System (INIS)

    Zwicker, R.D.; Schmidt-Ullrich, R.

    1996-01-01

    Purpose: Conventional low dose rate (LDR) planar Ir-192 implants are typically carried out using at most a few different source strengths. Remote afterloading offers a much higher degree of flexibility with individually programmable dwell times. Dedicated software is available to generate individual dwell times producing isodose surfaces which contour as closely as possible the target volume. The success of these algorithms in enclosing the target volume while sparing normal tissues is dependent on the positioning of the source guides which constrain the dwell points. In this work we provide source placement guidelines for optimal coverage and dose uniformity in planar high dose rate (HDR) implants. The resulting distributions are compared with LDR treatments in terms of dose uniformity and early and late tissue effects. Materials and methods: Computer studies were undertaken to determine source positions and dwell times for optimal dose uniformity in planar HDR implants, and the results were compared to those obtained using corresponding LDR implant geometries. The improvements in the dose distributions achieved with the remote after loader are expected to help offset the increased late tissue effects which can occur when LDR irradiation is replaced with a few large HDR fractions. Equivalent differential volume-dose (DVD) curves for early and late effects were calculated for different numbers of HDR fractions using a linear-quadratic model and compared to the corresponding curves for the LDR regime. Results: Tables of source placement parameters were generated as guidelines for achieving highly homogeneous planar HDR dose distributions. Differential volume-dose data generated inside the target volume provide a quantitative measure of the improvement in real dose homogeneity obtained with remote afterloading. The net result is a shift of the peak in the DVD curve toward lower doses relative to the LDR implant. The equivalent DVD curves for late effects obtained

  8. Electric discharge during electrosurgery.

    Science.gov (United States)

    Shashurin, Alexey; Scott, David; Zhuang, Taisen; Canady, Jerome; Beilis, Isak I; Keidar, Michael

    2015-04-16

    Electric discharge utilized for electrosurgery is studied by means of a recently developed method for the diagnostics of small-size atmospheric plasma objects based on Rayleigh scattering of microwaves on the plasma volume. Evolution of the plasma parameters in the near-electrode sheaths and in the positive column is measured and analyzed. It is found that the electrosurgical system produces a glow discharge of alternating current with strongly contracted positive column with current densities reaching 10(3) A/cm(2). The plasma electron density and electrical conductivities in the channel were found be 10(16) cm(-3) and (1-2) Ohm(-1) cm(-1), respectively. The discharge interrupts every instance when the discharge-driving AC voltage crosses zero and re-ignites again every next half-wave at the moment when the instant voltage exceeds the breakdown threshold.

  9. Vaginal delivery - discharge

    Science.gov (United States)

    Pregnancy - discharge after vaginal delivery ... You may have bleeding from your vagina for up to 6 weeks. Early on, you may pass some small clots when you first get up. Bleeding will slowly become ...

  10. Prostate radiation - discharge

    Science.gov (United States)

    ... this page: //medlineplus.gov/ency/patientinstructions/000399.htm Prostate radiation - discharge To use the sharing features on ... keeping or getting an erection may occur after prostate radiation therapy. You may not notice this problem ...

  11. Brain injury - discharge

    Science.gov (United States)

    ... this page: //medlineplus.gov/ency/patientinstructions/000163.htm Brain injury - discharge To use the sharing features on ... know was in the hospital for a serious brain injury. At home, it will take time for ...

  12. Brain aneurysm repair - discharge

    Science.gov (United States)

    ... this page: //medlineplus.gov/ency/patientinstructions/000123.htm Brain aneurysm repair - discharge To use the sharing features ... this page, please enable JavaScript. You had a brain aneurysm . An aneurysm is a weak area in ...

  13. Brain radiation - discharge

    Science.gov (United States)

    Radiation - brain - discharge; Cancer - brain radiation; Lymphoma - brain radiation; Leukemia - brain radiation ... Decadron) while you are getting radiation to the brain. It may make you hungrier, cause leg swelling ...

  14. Atrial fibrillation - discharge

    Science.gov (United States)

    ... this page: //medlineplus.gov/ency/patientinstructions/000237.htm Atrial fibrillation - discharge To use the sharing features on this ... have been in the hospital because you have atrial fibrillation . This condition occurs when your heart beats faster ...

  15. Pneumonia - adults - discharge

    Science.gov (United States)

    ... this page: //medlineplus.gov/ency/patientinstructions/000017.htm Pneumonia in adults - discharge To use the sharing features on this page, please enable JavaScript. You have pneumonia, which is an infection in your lungs. In ...

  16. Knee arthroscopy - discharge

    Science.gov (United States)

    ... page: //medlineplus.gov/ency/patientinstructions/000199.htm Knee arthroscopy - discharge To use the sharing features on this ... surgery to treat problems in your knee (knee arthroscopy). You may have been checked for: Torn meniscus. ...

  17. Cosmetic breast surgery - discharge

    Science.gov (United States)

    ... this page: //medlineplus.gov/ency/patientinstructions/000273.htm Cosmetic breast surgery - discharge To use the sharing features on this page, please enable JavaScript. You had cosmetic breast surgery to change the size or shape ...

  18. Shoulder surgery - discharge

    Science.gov (United States)

    ... this page: //medlineplus.gov/ency/patientinstructions/000179.htm Shoulder surgery - discharge To use the sharing features on this page, please enable JavaScript. You had shoulder surgery to repair the tissues inside or around your ...

  19. Discharges for lighting

    International Nuclear Information System (INIS)

    Stoffels, W W; Nimalasuriya, T; Flikweert, A J; Mulders, H C J

    2007-01-01

    The most common man-made discharge is a lamp. Even though lamps are often considered a mature technology, the discharge physics is often poorly understood. Two recent initiatives discussed here show that plasma research can help to make significant improvements. First we discuss color separation in metal halide lamps, which is a problem that prevents these highly efficient lamps from being used in more applications. Secondly a novel lamp concept is presented that may replace the current mercury based fluorescent lamps

  20. Discharge lamp technologies

    Energy Technology Data Exchange (ETDEWEB)

    Dakin, J. [GE Lighting, Cleveland, OH (United States)

    1994-12-31

    This talk is an overview of discharge lamp technology commonly employed in general lighting, with emphasis on issues pertinent to lighting for plant growth. Since the audience is primarily from the plant growth community, and this begins the light source part of the program, we will start with a brief description of the discharge lamps. Challenges of economics and of thermal management make lamp efficiency a prime concern in controlled environment agriculture, so we will emphasize science considerations relating to discharge lamp efficiency. We will then look at the spectra and ratings of some representative lighting products, and conclude with a discussion of technological advance. A general overview of discharge lighting technology can be found in the book of Waymouth (1971). A recent review of low pressure lighting discharge science is found in Dakin (1991). The pioneering paper of Reiling (1964) provides a good introduction to metal halide discharges. Particularly relevant to lighting for plant growth, a recent and thorough treatment of high pressure Na lamps is found in the book by deGroot and vanVliet (1986). Broad practical aspects of lighting application are thoroughly covered in the IES Lighting Handbook edited by Kaufman (1984).

  1. Chaos in gas discharges

    International Nuclear Information System (INIS)

    Piel, A.

    1993-01-01

    Many gas discharges exhibit natural oscillations which undergo a transition from regular to chaotic behavior by changing an experimental parameter or by applying external modulation. Besides several isolated investigations, two classes of discharge phenomena have been studied in more detail: ionization waves in medium pressure discharges and potential relaxation oscillations in filament cathode discharges at very low pressure. The latter phenomenon will be discussed by comparing experimental results from different discharge arrangements with particle-in-cell simulations and with a model based on the van-der-Pol equation. The filament cathode discharge has two stable modes of operation: the low current anode-glow-mode and the high current temperature-limited-mode, which form the hysteresis curve in the I(U) characteristics. Close to the hysteresis point of the AGM periodic relaxation oscillations occur. The authors demonstrate that the AGM can be understood by ion production in the anode layer, stopping of ions by charge exchange, and trapping in the virtual cathode around the filament. The relaxation oscillations consist of a slow filling phase and a rapid phase that invokes formation of an unstable double-layer, current-spiking, and ion depletion from the cathodic plasma. The relaxation oscillations can be mode-locked by external modulation. Inside a mode-locked state, a period doubling cascade is observed at high modulation degree

  2. Efficient planar n-i-p type heterojunction flexible perovskite solar cells with sputtered TiO2 electron transporting layers.

    Science.gov (United States)

    Mali, Sawanta S; Hong, Chang Kook; Inamdar, A I; Im, Hyunsik; Shim, Sang Eun

    2017-03-02

    The development of hybrid organo-lead trihalide perovskite solar cells (PSCs) comprising an electron transporting layer (ETL), a perovskite light absorber and a hole transporting layer (HTL) has received significant attention for their potential in efficient PSCs. However, the preparation of a compact and uniform ETL and the formation of a uniform light absorber layer suffer from a high temperature processing treatment and the formation of unwanted perovskite islands, respectively. A low temperature/room temperature processed ETL is one of the best options for the fabrication of flexible PSCs. In the present work, we report the implementation of a room temperature processed compact TiO 2 ETL and the synthesis of extremely uniform flexible planar PSCs based on methylammonium lead mixed halides MAPb(I 1-x Br x ) 3 (x = 0.1) via RF-magnetron sputtering and a toluene dripping treatment, respectively. The compact TiO 2 ETLs with different thicknesses (30 to 100 nm) were directly deposited on a flexible PET coated ITO substrate by varying the RF-sputtering time and used for the fabrication of flexible PSCs. The photovoltaic properties revealed that flexible PSC performance is strongly dependent on the TiO 2 ETL thickness. The open circuit voltage (V OC ) and fill factor (FF) are directly proportional to the TiO 2 ETL thickness while the 50 nm thick TiO 2 ETL shows the highest current density (J SC ) of 20.77 mA cm -2 . Our controlled results reveal that the room temperature RF-magnetron sputtered 50 nm-thick TiO 2 ETL photoelectrode exhibits a power conversion efficiency (PCE) in excess of 15%. The use of room temperature synthesis of the compact TiO 2 ETL by RF magnetron sputtering results in an enhancement of the device performance for cells prepared on flexible substrates. The champion flexible planar PSC based on this architecture exhibited a promising power conversion efficiency as high as 15.88%, featuring a high FF of 0.69 and V OC of 1.108 V with a negligible

  3. MCM Polarimetric Radiometers for Planar Arrays

    Science.gov (United States)

    Kangaslahti, Pekka; Dawson, Douglas; Gaier, Todd

    2007-01-01

    A polarimetric radiometer that operates at a frequency of 40 GHz has been designed and built as a prototype of multiple identical units that could be arranged in a planar array for scientific measurements. Such an array is planned for use in studying the cosmic microwave background (CMB). All of the subsystems and components of this polarimetric radiometer are integrated into a single multi-chip module (MCM) of substantially planar geometry. In comparison with traditional designs of polarimetric radiometers, the MCM design is expected to greatly reduce the cost per unit in an array of many such units. The design of the unit is dictated partly by a requirement, in the planned CMB application, to measure the Stokes parameters I, Q, and U of the CMB radiation with high sensitivity. (A complete definition of the Stokes parameters would exceed the scope of this article. In necessarily oversimplified terms, I is a measure of total intensity of radiation, while Q and U are measures of the relationships between the horizontally and vertically polarized components of radiation.) Because the sensitivity of a single polarimeter cannot be increased significantly, the only way to satisfy the high-sensitivity requirement is to make a large array of polarimeters that operate in parallel. The MCM includes contact pins that can be plugged into receptacles on a standard printed-circuit board (PCB). All of the required microwave functionality is implemented within the MCM; any required supporting non-microwave ("back-end") electronic functionality, including the provision of DC bias and control signals, can be implemented by standard PCB techniques. On the way from a microwave antenna to the MCM, the incoming microwave signal passes through an orthomode transducer (OMT), which splits the radiation into an h + i(nu) beam and an h - i(nu) beam (where, using complex-number notation, h denotes the horizontal component, nu denotes the vertical component, and +/-i denotes a +/-90deg phase

  4. Influences of the RF power ratio on the optical and electrical properties of GZO thin films by DC coupled RF magnetron sputtering at room temperature

    Energy Technology Data Exchange (ETDEWEB)

    Peng, Shou [State Key Laboratory of Advanced Technology for Float Glass, Bengbu 233018 (China); Bengbu Design & Research Institute for Glass Industry, Bengbu 233018 (China); Yao, Tingting, E-mail: yaott0815@163.com [State Key Laboratory of Advanced Technology for Float Glass, Bengbu 233018 (China); Bengbu Design & Research Institute for Glass Industry, Bengbu 233018 (China); Yang, Yong; Zhang, Kuanxiang; Jiang, Jiwen; Jin, Kewu; Li, Gang; Cao, Xin; Xu, Genbao; Wang, Yun [State Key Laboratory of Advanced Technology for Float Glass, Bengbu 233018 (China); Bengbu Design & Research Institute for Glass Industry, Bengbu 233018 (China)

    2016-12-15

    Ga-doped zinc oxide (GZO) thin films were deposited by closed field unbalanced DC coupled RF magnetron sputtering system at room temperature. The RF sputtering power ratio was adjusted from 0% to 100%. The crystal structure, surface morphology, transmittance and electrical resistivity of GZO films mainly influenced by RF sputtering power ratio were investigated by X-ray diffractometer, scanning electronic microscope, ultraviolet-visible spectrophotometer and Hall effect measurement. The research results indicate that the increasing RF power ratio can effectively reduce the discharge voltage of system and increase the ionizing rate of particles. Meanwhile, the higher RF power ratio can increase the carrier mobility in GZO thin film and improve the optical and electrical properties of GZO thin film significantly. Within the optimal discharge voltage window, the film deposits at 80% RF power ratio exhibits the lowest resistivity of 2.6×10{sup −4} Ω cm. We obtain the GZO film with the best average optical transmittance is approximately 84% in the visible wavelength. With the increasing RF power ratio, the densification of GZO film is enhanced. The densification of GZO film is decrease when the RF power ratio is 100%.

  5. Effect of deposition parameters on properties of ITO films prepared by reactive middle frequency pulsed dual magnetron sputtering

    International Nuclear Information System (INIS)

    Rogozin, A.I.; Vinnichenko, M.V.; Kolitsch, A.; Moeller, W.

    2004-01-01

    ITO layers with low resistivity and high visible transmittance were produced by means of middle frequency reactive dual magnetron sputtering. The influence of base pressure, Ar/O 2 ratio and magnetron pulse duration on the film composition, structure, electrical, and optical properties has been investigated. The deposition rate is proportional to the magnetron operation power at changing pulse duration and constant Ar and O 2 flows. At enhanced O 2 flows an onset of the magnetron target oxidation is discussed as a reason for the decrease of the deposition rate. The presence of water vapor in the residual gas is determined to be a reason for deterioration of resistivity and optical transmittance observed for ITO films produced at a base pressures higher than 5·10 -4 Pa. It is demonstrated that spectroscopic ellipsometry can be used as a noncontact tool to monitor the resistivity of ITO films

  6. Organic hybrid planar-nanocrystalline bulk heterojunctions

    Science.gov (United States)

    Forrest, Stephen R [Ann Arbor, MI; Yang, Fan [Piscataway, NJ

    2011-03-01

    A photosensitive optoelectronic device having an improved hybrid planar bulk heterojunction includes a plurality of photoconductive materials disposed between the anode and the cathode. The photoconductive materials include a first continuous layer of donor material and a second continuous layer of acceptor material. A first network of donor material or materials extends from the first continuous layer toward the second continuous layer, providing continuous pathways for conduction of holes to the first continuous layer. A second network of acceptor material or materials extends from the second continuous layer toward the first continuous layer, providing continuous pathways for conduction of electrons to the second continuous layer. The first network and the second network are interlaced with each other. At least one other photoconductive material is interspersed between the interlaced networks. This other photoconductive material or materials has an absorption spectra different from the donor and acceptor materials.

  7. Planar Hall Effect Sensors for Biodetection

    DEFF Research Database (Denmark)

    Rizzi, Giovanni

    . In the second geometry (dPHEB) half of the sensor is used as a local negative reference to subtract the background signal from magnetic beads in suspension. In all applications below, the magnetic beads are magnetised using the magnetic field due to the bias current passed through the sensor, i.e., no external...... as labels and planar Hall effect bridge (PHEB) magnetic field sensor as readout for the beads. The choice of magnetic beads as label is motivated by the lack of virtually any magnetic background from biological samples. Moreover, magnetic beads can be manipulated via an external magnetic field...... hybridisation in real-time, in a background of suspended magnetic beads. This characteristic is employed in single nucleotide polymorphism (SNP) genotyping, where the denaturation of DNA is monitored in real-time upon washing with a stringency buffer. The sensor setup includes temperature control and a fluidic...

  8. Development of Osaka gas type planar SOFC

    Energy Technology Data Exchange (ETDEWEB)

    Iha, M.; Shiratori, A.; Chikagawa, O. [Murata Mfg. Co., Ltd., Shiga (Japan)] [and others

    1996-12-31

    Osaka Gas Co. has been developing a planar type SOFC (OG type SOFC) which has a suitable structure for stacking. Murata Mfg. Co. has begun to develop the OG type SOFC stack through joint program since 1993. Figure 1 shows OG type cell structure. Because each cell is sustained by cell holders acting air manifold, the load of upper cell is not put on the lower cells. Single cell is composed of 3-layered membrane and LaCrO{sub 3} separator. 5 single cells are mounted on the cell holder, connected with Ni felt electrically, and bonded by glassy material sealant. We call the 5-cell stack a unit. Stacking 13 units, we succeeded 870 W generation in 1993. But the power density was low, 0.11 Wcm{sup -2} because of crack in the electrolyte and gas leakage at some cells.

  9. Renormalization of QED with planar binary trees

    International Nuclear Information System (INIS)

    Brouder, C.

    2001-01-01

    The Dyson relations between renormalized and bare photon and electron propagators Z 3 anti D(q)=D(q) and Z 2 anti S(q)=S(q) are expanded over planar binary trees. This yields explicit recursive relations for the terms of the expansions. When all the trees corresponding to a given power of the electron charge are summed, recursive relations are obtained for the finite coefficients of the renormalized photon and electron propagators. These relations significantly decrease the number of integrals to carry out, as compared to the standard Feynman diagram technique. In the case of massless quantum electrodynamics (QED), the relation between renormalized and bare coefficients of the perturbative expansion is given in terms of a Hopf algebra structure. (orig.)

  10. Anions, quantum particles in planar systems

    International Nuclear Information System (INIS)

    Monerat, Germano Amaral

    2000-03-01

    Our purpose here is to present a general review of the non-relativistic quantum-mechanical description of excitations that do not obey neither the Fermi-Dirac nor the Bose-Einstein statistics; they rather fulfill an intermediate statistics, the we called 'any-statistics'. As we shall see, this is a peculiarity of (1+1) and (1+2) dimensions, due to the fact that, in two space dimensions, the spin is not quantised, once the rotation group is Abelian. The relevance of studying theories in (1+2) dimensions is justified by the evidence that, in condensed matter physics, there are examples of planar systems, for which everything goes as if the third spatial dimension is frozen. (author)

  11. Dielectric response of planar relativistic quantum plasmas

    International Nuclear Information System (INIS)

    Bardos, D.C.; Frankel, N.E.

    1991-01-01

    The dielectric response of planar relativistic charged particle-antiparticle plasmas is investigated, treating Fermi and Bose plasmas. The conductivity tensor in each case is derived in the self-consistent Random Phase Approximation. The tensors are then evaluated at zero temperature for the case of no external fields, leading to explicit dispersion relations for the electrodynamic modes of the plasma. The longitudinal and transverse modes are in general coupled for plasma layers. This coupling vanishes, however, in the zero field case, allowing 'effective' longitudinal and transverse dielectric functions to be defined in terms of components of the conductivity tensor. Solutions to the longitudinal mode equations (i.e. plasmon modes) are exhibited, while purely transverse modes are found not to exist. In the case of the Bose plasma the screening of a test charge is investigated in detail. 41 refs., 1 fig

  12. Planar Silicon Optical Waveguide Light Modulators

    DEFF Research Database (Denmark)

    Leistiko, Otto; Bak, H.

    1994-01-01

    that values in the nanosecond region should be possible, however, the measured values are high, 20 microseconds, due to the large area of the injector junctions, 1× 10¿2 cm2, and the limitations imposed by the detection circuit. The modulating properties of these devices are impressive, measurements......The results of an experimental investigation of a new type of optical waveguide based on planar technology in which the liglht guiding and modulation are achieved by exploiting free carrier effects in silicon are presented. Light is guided between the n+ substrate and two p+ regions, which also...... serve as carrier injectors for controling absorption. Light confinement of single mode devices is good, giving spot sizes of 9 ¿m FWHM. Insertion loss measurements indicate that the absorption losses for these waveguides are extremely low, less 1 dB/cm. Estimates of the switching speed indicate...

  13. Discrete approach to complex planar geometries

    International Nuclear Information System (INIS)

    Cupini, E.; De Matteis, A.

    1974-01-01

    Planar regions in Monte Carlo transport problems have been represented by a finite set of points with a corresponding region index for each. The simulation of particle free-flight reduces then to the simple operations necessary for scanning appropriate grid points to determine whether a region other than the starting one is encountered. When the complexity of the geometry is restricted to only some regions of the assembly examined, a mixed discrete-continuous philosophy may be adopted. By this approach, the lattice of a thermal reactor has been treated, discretizing only the central regions of the cell containing the fuel rods. Excellent agreement with experimental results has been obtained in the computation of cell parameters in the energy range from fission to thermalization through the 238 U resonance region. (U.S.)

  14. Two solvable problems of planar geometrical optics.

    Science.gov (United States)

    Borghero, Francesco; Bozis, George

    2006-12-01

    In the framework of geometrical optics we consider a two-dimensional transparent inhomogeneous isotropic medium (dispersive or not). We show that (i) for any family belonging to a certain class of planar monoparametric families of monochromatic light rays given in the form f(x,y)=c of any definite color and satisfying a differential condition, all the refractive index profiles n=n(x,y) allowing for the creation of the given family can be found analytically (inverse problem) and that (ii) for any member of a class of two-dimensional refractive index profiles n=n(x,y) satisfying a differential condition, all the compatible families of light rays can be found analytically (direct problem). We present appropriate examples.

  15. Coupling Planar Cell Polarity Signaling to Morphogenesis

    Directory of Open Access Journals (Sweden)

    Jeffrey D. Axelrod

    2002-01-01

    Full Text Available Epithelial cells and other groups of cells acquire a polarity orthogonal to their apical–basal axes, referred to as Planar Cell Polarity (PCP. The process by which these cells become polarized requires a signaling pathway using Frizzled as a receptor. Responding cells sense cues from their environment that provide directional information, and they translate this information into cellular asymmetry. Most of what is known about PCP derives from studies in the fruit fly, Drosophila. We review what is known about how cells translate an unknown signal into asymmetric cytoskeletal reorganization. We then discuss how the vertebrate processes of convergent extension and cochlear hair-cell development may relate to Drosophila PCP signaling.

  16. Morphing Planar Graph Drawings with a Polynomial Number of Steps

    DEFF Research Database (Denmark)

    Alamdari, Soroush; Angelini, Patrizio; Chan, Timothy M.

    2013-01-01

    In 1944, Cairns proved the following theorem: given any two straight-line planar drawings of a triangulation with the same outer face, there exists a morph (i.e., a continuous transformation) between the two drawings so that the drawing remains straight-line planar at all times. Cairns’s original...

  17. Design and measurements of the double layer planar motor

    NARCIS (Netherlands)

    Rovers, J.M.M.; Jansen, J.W.; Lomonova, E.

    2013-01-01

    Moving-magnet magnetically levitated planar motors are considered for use as a wafer stage in the semiconductor lithographic industry. This puts high requirements on the accuracy and the dissipated power and cooling performance of such motors. A novel planar motor topology is developed, which

  18. The peeling process of infinite Boltzmann planar maps

    DEFF Research Database (Denmark)

    Budd, Timothy George

    2016-01-01

    criterion has a very simple interpretation. The finite random planar maps under consideration were recently proved to possess a well-defined local limit known as the infinite Boltzmann planar map (IBPM). Inspired by recent work of Curien and Le Gall, we show that the peeling process on the IBPM can...

  19. Column Planarity and Partially-Simultaneous Geometric Embedding

    Czech Academy of Sciences Publication Activity Database

    Barba, L.; Evans, W.; Hoffmann, M.; Kusters, V.; Saumell, Maria; Speckmann, B.

    2017-01-01

    Roč. 21, č. 6 (2017), s. 983-1002 ISSN 1526-1719 Grant - others:GA MŠk(CZ) LO1506; GA MŠk(CZ) EE2.3.30.0038 Institutional support: RVO:67985807 Keywords : column planarity * unlabeled level planarity * simultaneous geometric embedding Subject RIV: BA - General Mathematics OBOR OECD: Pure mathematics

  20. Deposition of thin films by magnetron sputtering molybdenum in samples of pure copper; Deposicao de filmes finos de molibdenio por magnetron sputtering em amostra de cobre puro

    Energy Technology Data Exchange (ETDEWEB)

    Ferreira, N.M.; Almeida, E.O. de; Alves Junior, C. [Universidade Federal do Rio Grande do Norte, Campus Universitario Lagoa Nova, PPGCEM - Natal, RN (Brazil); Lourenco, J.M. [Instituto Federal de Educacao, Ciencias e Tecnologia do Rio Grande do Norte (IFRN), Natal, RN (Brazil)

    2010-07-01

    The deposition surface is a process of thermochemical treatment, which involves the deposition of a thin film usually about one to two microns on a metallic substrate, which constitutes one of the most important surface engineering techniques. The plasma deposition process with the configuration of magnetron sputtering it is removing material from a solid surface (target) through the impact of energetic particles from plasma. The aim of this study is to characterize the microstructure of the material under study using the techniques of optical microscopy and scanning electron microscopy. (author)

  1. The Sheath-less Planar Langmuir Probe

    Science.gov (United States)

    Cooke, D. L.

    2017-12-01

    The Langmuir probe is one of the oldest plasma diagnostics, provided the plasma density and species temperature from analysis of a current-voltage curve as the voltage is swept over a practically chosen range. The analysis depends on a knowledge or theory of the many factors that influence the current-voltage curve including, probe shape, size, nearby perturbations, and the voltage reference. For applications in Low Earth Orbit, the Planar Langmuir Probe, PLP, is an attractive geometry because the ram ion current is very constant over many Volts of a sweep, allowing the ion density and electron temperature to be determined independently with the same instrument, at different points on the sweep. However, when the physical voltage reference is itself small and electrically floating as with a small spacecraft, the spacecraft and probe system become a double probe where the current collection theory depends on the interaction of the spacecraft with the plasma which is generally not as simple as the probe itself. The Sheath-less PLP, SPLP, interlaces on a single ram facing surface, two variably biased probe elements, broken into many small and intertwined segments on a scale smaller than the plasma Debye length. The SPLP is electrically isolated from the rest of the spacecraft. For relative bias potentials of a few volts, the ion current to all segments of each element will be constant, while the electron currents will vary as a function of the element potential and the electron temperature. Because the segments are small, intertwined, and floating, the assembly will always present the same floating potential to the plasma, with minimal growth as a function of voltage, thus sheath-less and still planar. This concept has been modelled with Nascap, and tested with a physical model inserted into a Low Earth Orbit-like chamber plasma. Results will be presented.

  2. Vehicle exhaust gas clearance by low temperature plasma-driven nano-titanium dioxide film prepared by radiofrequency magnetron sputtering.

    Directory of Open Access Journals (Sweden)

    Shuang Yu

    Full Text Available A novel plasma-driven catalysis (PDC reactor with special structure was proposed to remove vehicle exhaust gas. The PDC reactor which consisted of three quartz tubes and two copper electrodes was a coaxial dielectric barrier discharge (DBD reactor. The inner and outer electrodes firmly surrounded the outer surface of the corresponding dielectric barrier layer in a spiral way, respectively. Nano-titanium dioxide (TiO2 film prepared by radiofrequency (RF magnetron sputtering was coated on the outer wall of the middle quartz tube, separating the catalyst from the high voltage electrode. The spiral electrodes were designed to avoid overheating of microdischarges inside the PDC reactor. Continuous operation tests indicated that stable performance without deterioration of catalytic activity could last for more than 25 h. To verify the effectiveness of the PDC reactor, a non-thermal plasma(NTP reactor was employed, which has the same structure as the PDC reactor but without the catalyst. The real vehicle exhaust gas was introduced into the PDC reactor and NTP reactor, respectively. After the treatment, compared with the result from NTP, the concentration of HC in the vehicle exhaust gas treated by PDC reactor reduced far more obviously while that of NO decreased only a little. Moreover, this result was explained through optical emission spectrum. The O emission lines can be observed between 870 nm and 960 nm for wavelength in PDC reactor. Together with previous studies, it could be hypothesized that O derived from catalytically O3 destruction by catalyst might make a significant contribution to the much higher HC removal efficiency by PDC reactor. A series of complex chemical reactions caused by the multi-components mixture in real vehicle exhaust reduced NO removal efficiency. A controllable system with a real-time feedback module for the PDC reactor was proposed to further improve the ability of removing real vehicle exhaust gas.

  3. Yangian-type symmetries of non-planar leading singularities

    Energy Technology Data Exchange (ETDEWEB)

    Frassek, Rouven [Department of Mathematical Sciences, Durham University,South Road, Durham DH1 3LE (United Kingdom); Meidinger, David [Institut für Mathematik und Institut für Physik, Humboldt-Universität zu Berlin,Zum Großen Windkanal 6, 12489 Berlin (Germany)

    2016-05-18

    We take up the study of integrable structures behind non-planar contributions to scattering amplitudes in N = 4 super Yang-Mills theory. Focusing on leading singularities, we derive the action of the Yangian generators on color-ordered subsets of the external states. Each subset corresponds to a single boundary of the non-planar on-shell diagram. While Yangian invariance is broken, we find that higher-level Yangian generators still annihilate the non-planar on-shell diagram. For a given diagram, the number of these generators is governed by the degree of non-planarity. Furthermore, we present additional identities involving integrable transfer matrices. In particular, for diagrams on a cylinder we obtain a conservation rule similar to the Yangian invariance condition of planar on-shell diagrams. To exemplify our results, we consider a five-point MHV on-shell function on a cylinder.

  4. On Longest Cycles in Essentially 4-Connected Planar Graphs

    Directory of Open Access Journals (Sweden)

    Fabrici Igor

    2016-08-01

    Full Text Available A planar 3-connected graph G is essentially 4-connected if, for any 3-separator S of G, one component of the graph obtained from G by removing S is a single vertex. Jackson and Wormald proved that an essentially 4-connected planar graph on n vertices contains a cycle C such that . For a cubic essentially 4-connected planar graph G, Grünbaum with Malkevitch, and Zhang showed that G has a cycle on at least ¾ n vertices. In the present paper the result of Jackson and Wormald is improved. Moreover, new lower bounds on the length of a longest cycle of G are presented if G is an essentially 4-connected planar graph of maximum degree 4 or G is an essentially 4-connected maximal planar graph.

  5. Ambient mass spectrometry: From the planar to the non-planar surface analysis

    Czech Academy of Sciences Publication Activity Database

    Rejšek, Jan; Vrkoslav, Vladimír; Cvačka, Josef

    2017-01-01

    Roč. 15, č. 1 (2017), s. 31 ISSN 2336-7202. [Mezioborové setkání mladých biologů, biochemiků a chemiků /17./. 30.05.2017-01.06.2017, Milovy] Institutional support: RVO:61388963 Keywords : ambient mass spectrometry * thin layer chromatography * non-planar surface analysis Subject RIV: CB - Analytical Chemistry, Separation

  6. Chaotic non-planar vibrations of the thin elastica. Part I: Experimental observation of planar instability

    Science.gov (United States)

    Cusumano, J. P.; Moon, F. C.

    1995-01-01

    In this two-part paper, the results of an investigation into the non-linear dynamics of a flexible cantilevered rod (the elastica) with a thin rectangular cross-section are presented. An experimental examination of the dynamics of the elastica over a broad parameter range forms the core of Part I. In Part II, the experimental work is related to a theoretical study of the mechanics of the elastica, and the study of a two-degree-of-freedom model obtained by modal projection. The experimental system used in this investigation is a rod with clamped-free boundary conditions, forced by sinusoidally displacing the clamped end. Planar periodic motions of the driven elastica are shown to lose stability at distinct resonant wedges, and the resulting motions are shown in general to be non-planar, chaotic, bending-torsion oscillations. Non-planar motions in all resonances exhibit energy cascading and dynamic two-well phenomena, and a family of asymmetric, bending-torsion non-linear modes is discovered. Correlation dimension calculations are used to estimate the number of active degrees of freedom in the system.

  7. Surface modification by preparation of buffer zone in glow-discharge plasma

    International Nuclear Information System (INIS)

    Cho, D.L.

    1986-01-01

    Reactive species, energetic particles, and uv radiation in the plasma created by a glow discharge strongly interact with solid surfaces under the influence of the plasma. As a result of the strong interaction, various physical and chemical reactions, unique and advantageous for the surface modification of solid materials, occur on the solid surfaces. The surface modification is carried out through formation of a thin buffering layer on the solid surface. The preparation of a buffer zone on solid surfaces for surface modification is described. Two kinds of a buffer zone are prepared by plasma polymerization, or simultaneous sputter deposition of electrode material with plasma polymerization: a transitional buffer zone and a graded buffer zone. Important factors for preparation of the buffer zone (pre-conditioning of a substrate surface, thin-film deposition, post-treatment of the film, magnetron discharge, energy input, geometry of a substrate and a plasma) are discussed

  8. Preparation and Characterization of FC Films Coated on PET Substrates by RF Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Huang Mei-lin

    2018-01-01

    Full Text Available Fluorocarbon (FC films were prepared on polyethylene terephthalate (PET plates and PET fabrics respectively by a radiofrequency (RF magnetron sputtering technique using polytetrafluoroethylene (PTFE as a target. Scanning electron microscope and X-ray photoelectron spectroscopy were used to investigate the morphology, structure and composition of the obtained FC films. The hydrophobicity and uvioresistant properties of the FC film coated fabric were studied. The results show that the FC films were successfully deposited on the PET substrates by a RF magnetron sputtering. The deposited films are made up of four components -CF3, -CF2-, CF- and -C-. The proportions of the four components and surface morphologies of the deposited films vary with the sputtering conditions. Compared with the original fabric samples, the hydrophobicity of the FC film coated fabrics is quite good and improved significantly.

  9. Microstructural evaluation of NiTi-based films deposited by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Crăciunescu, Corneliu M., E-mail: corneliu.craciunescu@upt.ro; Mitelea, Ion, E-mail: corneliu.craciunescu@upt.ro; Budău, Victor, E-mail: corneliu.craciunescu@upt.ro [Department of Materials and Manufacturing Engineering, Politehnica University of Timisoara (Romania); Ercuţa, Aurel [Department of Materials and Manufacturing Engineering, Politehnica University of Timisoara and Department of Physics, West University Timisoara (Romania)

    2014-11-24

    Shape memory alloy films belonging to the NiTi-based systems were deposited on heated and unheated substrates, by magnetron sputtering in a custom made system, and their structure and composition was analyzed using electron microscopy. Several substrates were used for the depositions: glass, Cu-Zn-Al, Cu-Al-Ni and Ti-NiCu shape memory alloy ribbons and kapton. The composition of the Ti-Ni-Cu films showed limited differences, compared to the one of the target and the microstructure for the DC magnetron sputtering revealed crystallized structure with features determined on peel off samples from a Si wafer. Both inter and transcrystalline fractures were observed and related to the interfacial stress developed on cooling from deposition temperature.

  10. Heat treatable indium tin oxide films deposited with high power pulse magnetron sputtering

    International Nuclear Information System (INIS)

    Horstmann, F.; Sittinger, V.; Szyszka, B.

    2009-01-01

    In this study, indium tin oxide (ITO) films were prepared by high power pulse magnetron sputtering [D. J. Christie, F. Tomasel, W. D. Sproul, D. C. Carter, J. Vac. Sci. Technol. A, 22 (2004) 1415. ] without substrate heating. The ITO films were deposited from a ceramic target at a deposition rate of approx. 5.5 nm*m/min kW. Afterwards, the ITO films were covered with a siliconoxynitride film sputtered from a silicon alloy target in order to prevent oxidation of the ITO film during annealing at 650 deg. C for 10 min in air. The optical and electrical properties as well as the texture and morphology of these films were investigated before and after annealing. Mechanical durability of the annealed films was evaluated at different test conditions. The results were compared with state-of-the art ITO films which were obtained at optimized direct current magnetron sputtering conditions

  11. Investigation of photocatalytic activity of titanium dioxide deposited on metallic substrates by DC magnetron sputtering

    DEFF Research Database (Denmark)

    Daviðsdóttir, Svava; Canulescu, Stela; Dirscherl, Kai

    2013-01-01

    The photocatalytic properties of titanium dioxide (TiO2) coating in the anatase crystalline structure deposited on aluminium AA1050 alloy and stainless steel S316L substrates were investigated. The coating was prepared by DC magnetron sputtering. The microstructure and surface morphology of the c......The photocatalytic properties of titanium dioxide (TiO2) coating in the anatase crystalline structure deposited on aluminium AA1050 alloy and stainless steel S316L substrates were investigated. The coating was prepared by DC magnetron sputtering. The microstructure and surface morphology...... sweep voltammetry, impedance measurements. The microstructure and surface morphology of the coating were similar irrespective of the nature of the substrate, while the photocatalytic behaviour was found to vary depending on the substrate type. In general the TiO2 coating on stainless steel was shown...

  12. Catalytic growth of ZnO nanostructures by r.f. magnetron sputtering

    Directory of Open Access Journals (Sweden)

    Arroyo-Hernández María

    2011-01-01

    Full Text Available Abstract The catalytic effect of gold seed particles deposited on a substrate prior to zinc oxide (ZnO thin film growth by magnetron sputtering was investigated. For this purpose, selected ultra thin gold layers, with thicknesses close to the percolation threshold, are deposited by thermal evaporation in ultra high vacuum (UHV conditions and subsequently annealed to form gold nanodroplets. The ZnO structures are subsequently deposited by r.f. magnetron sputtering in a UHV chamber, and possible morphological differences between the ZnO grown on top of the substrate and on the gold are investigated. The results indicate a moderate catalytic effect for a deposited gold underlayer of 4 nm, quite close to the gold thin film percolation thickness.

  13. Low temperature magnetron sputter deposition of polycrystalline silicon thin films using high flux ion bombardment

    International Nuclear Information System (INIS)

    Gerbi, Jennifer E.; Abelson, John R.

    2007-01-01

    We demonstrate that the microstructure of polycrystalline silicon thin films depends strongly on the flux of low energy ions that bombard the growth surface during magnetron sputter deposition. The deposition system is equipped with external electromagnetic coils which, through the unbalanced magnetron effect, provide direct control of the ion flux independent of the ion energy. We report the influence of low energy ( + on the low temperature ( + ions to silicon neutrals (J + /J 0 ) during growth by an order of magnitude (from 3 to 30) enables the direct nucleation of polycrystalline Si on glass and SiO 2 coated Si at temperatures below 400 degree sign C. We discuss possible mechanisms for this enhancement of crystalline microstructure, including the roles of enhanced adatom mobility and the formation of shallow, mobile defects

  14. Properties of H- and D- beams from magnetron and Penning sources

    International Nuclear Information System (INIS)

    Sluyters, T.; Kovarik, V.

    1979-01-01

    The quality of negative hydrogen isotope beams are evaluated after extraction from magnetron and Penning sources. The general conclusions of these measurements are that: (a) the beam quality from these plasma sources are adequate for the transport of high current negative ion beams in bending magnets; (b) there is evidence of practically complete space charge neutralization in the drift space beyond the extractor; (c) the beam performance from the Penning source appears to be better compared with the magnetron source; and (d) it is likely that the high electric field gradient and a concave ion emission boundary are responsible for a beam cross-over near the anode aperture, which causes beam divergence practically independent of the extraction geometry

  15. The microstructure and properties of titanium dioxide films synthesized by unbalanced magnetron sputtering

    International Nuclear Information System (INIS)

    Leng, Y.X.; Chen, J.Y.; Yang, P.; Sun, H.; Huang, N.

    2007-01-01

    In this work, titanium oxide films were deposited on Ti6Al4V and Si (1 0 0) by DC unbalanced magnetron sputtering method at different oxygen pressure. X-ray diffraction (XRD), microhardness tests, pin-on-disk wear experiments, surface contact angle tests and platelet adhesion investigation were conducted to evaluate the properties of the films. The corrosion behavior of titanium dioxide films was characterized by potentiodynamic polarization. The results showed that titanium oxide films deposited by unbalance magnetron sputtering were compact and could obviously enhance microhardness, wear resistance of titanium alloy substrate. Potentiodynamic polarization curves showed that Ti-6Al-4V deposited with titanium dioxide films had lower dissolution currents than that of the uncoated one. The results of in vitro hemocompatibility analyses indicated that the blood compatibility of the titanium dioxide films with bandgap 3.2 eV have better blood compatibility

  16. High power pulsed magnetron sputtering: A method to increase deposition rate

    International Nuclear Information System (INIS)

    Raman, Priya; McLain, Jake; Ruzic, David N; Shchelkanov, Ivan A.

    2015-01-01

    High power pulsed magnetron sputtering (HPPMS) is a state-of-the-art physical vapor deposition technique with several industrial applications. One of the main disadvantages of this process is its low deposition rate. In this work, the authors report a new magnetic field configuration, which produces deposition rates twice that of conventional magnetron's dipole magnetic field configuration. Three different magnet pack configurations are discussed in this paper, and an optimized magnet pack configuration for HPPMS that leads to a higher deposition rate and nearly full-face target erosion is presented. The discussed magnetic field produced by a specially designed magnet assembly is of the same size as the conventional magnet assembly and requires no external fields. Comparison of deposition rates with different power supplies and the electron trapping efficiency in complex magnetic field arrangements are discussed

  17. Red herring vaginal discharge.

    Science.gov (United States)

    Lee, Jun Hee; Pringle, Kirsty; Rajimwale, Ashok

    2013-09-18

    Labial hair tourniquet syndrome is a rare condition that can be easily misdiagnosed and ultimately lead to irreversible damage. An 11-year-old premenarche girl presented with a 5-day history of pain and swelling in the labia with associated vaginal discharge. The general practitioner treated her with clotrimazole without improvement. On examination, there was an oedematous swelling of the right labia with a proximal hair tourniquet. Local anaesthetic was applied and the hair removed with forceps. There was instant relief of pain and the discharge stopped within 24 h. The patient was sent home with a course of antibiotics.

  18. Reactive magnetron sputtering of Si-C-N films with controlled mechanical and optical properties

    Czech Academy of Sciences Publication Activity Database

    Vlček, J.; Kormunda, M.; Čížek, J.; Soukup, Z.; Peřina, Vratislav; Zemek, Josef

    2003-01-01

    Roč. 12, č. 8 (2003), s. 1287-1294 ISSN 0925-9635 R&D Projects: GA MŠk ME 203; GA MŠk OC 527.90 Institutional research plan: CEZ:MSM 235200002 Keywords : silicon-carbon-nitride films * magnetron co-sputtering Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders Impact factor: 1.867, year: 2003

  19. Nucleation of ultrathin silver layer by magnetron sputtering in Ar/N2 plasma

    Czech Academy of Sciences Publication Activity Database

    Bulíř, Jiří; Novotný, Michal; Lančok, Ján; Fekete, Ladislav; Drahokoupil, Jan; Musil, Jindřich

    2013-01-01

    Roč. 228, č. 1 (2013), S86-S90 ISSN 0257-8972 R&D Projects: GA ČR(CZ) GAP108/11/1298; GA ČR GP202/09/P324 Institutional support: RVO:68378271 Keywords : ultrathin silver * magnetron sputtering * spectral ellipsometry * in-situ monitoring Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 2.199, year: 2013

  20. RF magnetron sputtering and evaporation of polyisobutylene and low density polyethylene

    Czech Academy of Sciences Publication Activity Database

    Kousal, J.; Hanuš, J.; Choukourov, A.; Hlídek, P.; Biederman, H.; Slavinská, D.; Zemek, Josef

    2005-01-01

    Roč. 200, 1-4 (2005), s. 472-475 ISSN 0257-8972 R&D Projects: GA MŠk(CZ) OC 527.10; GA MŠk(CZ) ME 553 Institutional research plan: CEZ:AV0Z10100521 Keywords : magnetron * radio frequency * sputtering * polyethylene * polyisobutylene Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.646, year: 2005

  1. Deposition of thin titanium-copper films with antimicrobial effect by advanced magnetron sputtering methods

    Czech Academy of Sciences Publication Activity Database

    Straňák, V.; Wulff, H.; Rebl, H.; Zietz, C.; Arndt, K.; Bogdanowicz, R.; Nebe, B.; Bader, R.; Podbielski, A.; Hubička, Zdeněk; Hippler, R.

    2011-01-01

    Roč. 31, č. 7 (2011), s. 1512-1519 ISSN 0928-4931 R&D Projects: GA ČR(CZ) GAP205/11/0386; GA MŠk(CZ) 1M06002 Institutional research plan: CEZ:AV0Z10100520 Keywords : implant coating * titanium-copper film * pulsed magnetron sputtering Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 2.686, year: 2011

  2. Epitaxial growth of "infinite layer” thin films and multilayers by rf magnetron sputtering

    OpenAIRE

    Fàbrega, L.; Koller, E.; Triscone, J. M.; Fischer, Ø.

    2017-01-01

    We report on the preparation and characterization of epitaxial ACuO2 (A = Sr, Ca, Ba) thin films and multilayers with the so- called infinite layer (IL) structure, by rf magnetron sputtering. Films and multilayers without Ba have a remarkable crystal quality, whereas those containing this large ion are often multiphased and unstable. In spite of the excellent crystalline quality of these samples, obtaining thin films having both IL structure and displaying superconducting properties has not s...

  3. Rutile TiO2 thin films grown by reactive high power impulse magnetron sputtering

    International Nuclear Information System (INIS)

    Agnarsson, B.; Magnus, F.; Tryggvason, T.K.; Ingason, A.S.; Leosson, K.; Olafsson, S.; Gudmundsson, J.T.

    2013-01-01

    Thin TiO 2 films were grown on Si(001) substrates by reactive dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) at temperatures ranging from 300 to 700 °C. Optical and structural properties of films were compared both before and after post-annealing using scanning electron microscopy, low angle X-ray reflection (XRR), grazing incidence X-ray diffractometry and spectroscopic ellipsometry. Both dcMS- and HiPIMS-grown films reveal polycrystalline rutile TiO 2 , even prior to post-annealing. The HiPIMS-grown films exhibit significantly larger grains compared to that of dcMC-grown films, approaching 100% of the film thickness for films grown at 700 °C. In addition, the XRR surface roughness of HiPIMS-grown films was significantly lower than that of dcMS-grown films over the whole temperature range 300–700 °C. Dispersion curves could only be obtained for the HiPIMS-grown films, which were shown to have a refractive index in the range of 2.7–2.85 at 500 nm. The results show that thin, rutile TiO 2 films, with high refractive index, can be obtained by HiPIMS at relatively low growth temperatures, without post-annealing. Furthermore, these films are smoother and show better optical characteristics than their dcMS-grown counterparts. - Highlights: • We demonstrate growth of rutile TiO 2 on Si (111) by high power impulse magnetron sputtering. • The films exhibit significantly larger grains than dc magnetron sputtered films • TiO 2 films with high refractive index are obtained without post-growth annealing

  4. Test stand for magnetron H negative ion source at IPP-Nagoya

    Energy Technology Data Exchange (ETDEWEB)

    Okamura, H; Kuroda, T; Miyahara, A

    1981-02-01

    Test facilities for the development of magnetron H(-) ion source consists of the vacuum system, power supplies, diagnostic equipment, and their controlling electronics. Schematics are presented and relevant items described including sequence control, optical links, the charged pulse forming network, the extractor power supply, magnet power supply, temperature control of the cesium feeder, and the pulsed valve driver. Noise problems and diagnostics are also considered.

  5. Advanced TiC/a-C: H nanocomposite coatings deposited by magnetron sputtering

    OpenAIRE

    Pei, Y.T.; Galvan, D.; Hosson, J.Th.M. De; Strondl, C.

    2006-01-01

    TiC/a-C:H nanocomposite coatings have been deposited by magnetron Sputtering. They consist of 2-5 nm TiC nanocrystallites embedded in the amorphous hydrocarbon (a-C:H) matrix. A transition from a Columnar to a glassy microstructure has been observed in the nanocomposite coatings with increasing substrate bias or carbon content. Micro-cracks induced by nanoindentation or wear tests readily propagate through the column boundaries whereas the coatings without a columnar inicrostructure exhibit s...

  6. Overview of recent studies and design changes for the FNAL magnetron ion source

    Science.gov (United States)

    Bollinger, D. S.; Sosa, A.

    2017-08-01

    This paper presents several studies and design changes that will eventually be implemented to the Fermi National Accelerator Laboratory (FNAL) magnetron ion source. The topics include tungsten cathode insert, solenoid gas valves, current controlled arc pulser, cesium boiler redesign, gas mixtures of hydrogen and nitrogen, and duty factor reduction. The studies were performed on the FNAL test stand described in [1], with the aim to improve source lifetime, stability, and reducing the amount of tuning needed.

  7. Overview of Recent Studies and Design Changes for the FNAL Magnetron Ion Source

    Energy Technology Data Exchange (ETDEWEB)

    Bollinger, D. S. [Fermilab; Sosa, A. [Fermilab

    2016-09-06

    This paper will cover several studies and design changes that will eventually be implemented to the Fermi National Accelerator Laboratory (FNAL) magnetron ion source. The topics include tungsten cathode insert, solenoid gas valves, current controlled arc pulser, cesium boiler redesign, gas mixtures of hydrogen and nitrogen, and duty factor reduction. The studies were performed on the FNAL test stand described in [1], with the aim to improve source lifetime, stability, and reducing the amount of tuning needed.

  8. Contribution to mechanical and crystallographic analysis of molyledenum layers prepared by magnetron cathode sputtering

    International Nuclear Information System (INIS)

    Bosland, P.

    1988-01-01

    Molybdenum coatings presenting different compression stresses are elaborated by magnetron cathode sputtering by varying the negative voltage of the substrate during deposition. Stress evolution is accompanied by crystal texture evolution and argon content incorporated in the layers. Crystallite orientation is explained by a phenomenon similar to canalisation observed in ion implantation. In a same deposit each component presents its own deformations different from neighbouring components [fr

  9. Travelling-wave-sustained discharges

    International Nuclear Information System (INIS)

    Schlueter, Hans; Shivarova, Antonia

    2007-01-01

    This review is on discharges maintained by travelling waves: new plasma sources, discovered in 1974 and considered as a prototype of the gas discharges according to their definition as nonlinear systems which unify in a self-consistent manner plasmas and fields. In the presentation here of the fluid-plasma models of the diffusion-controlled regime of the travelling-wave-sustained discharges (TWSDs), the basic features of the discharge maintenance-the discharge self-consistency and the electron heating in the high-frequency field-are stressed. Operation of stationary and pulsed discharges, discharge maintenance without and in external magnetic fields as well as discharge production in different gases (argon, helium, helium-argon gas mixtures and hydrogen) are covered. Modulation instability of diffusion-controlled discharges and discharge filamentation at higher gas pressures are also included in the review. Experimental findings which motivate aspects of the reported modelling are pointed out

  10. Experimental and spectroscopic study of flow actuation phenomena using DC discharge at a Mach 3 flow.

    Science.gov (United States)

    Shin, J.; Narayanaswamy, V.; Raja, L.; Clemens, N.

    2006-10-01

    A study of flow actuation phenomena of DC discharge will be presented. An array of pin-like electrodes is flush mounted on a co-planar ceramic actuator that is inserted in the test section. The different discharge structures -- diffuse, constricted, and mixed mode -- are observed in the presence of a flow. A discernable actuation, as visualized by schlieren imaging, is achieved by diffuse discharge, whereas the constricted discharge does not show detectable flow perturbation at the same current. The flow actuation in the form of an induced oblique shock occurs within one frame of laser schlieren imaging at 4.5 kHz. Rotational (gas) and vibrational temperatures are measured by fitting spectra of N2 and N2+ bands near 365-395 nm. Electronic temperatures are measured using Boltzmann plot of Fe (I) lines. Gas temperatures of diffuse discharges drop from ˜1500 K to ˜500 K in the presence of a flow while vibrational and electronic temperatures remain almost the same at ˜3000 K and ˜1.25 eV, respectively. Gas temperatures of constricted discharge are found to be similar with diffuse discharge whereas only diffuse discharge shows an actuation. An examination of spatial extent of the plasma reveals that the diffuse discharge occupies a larger region of the flow than the constricted discharge. This indicates that the flow actuation is dependent on flow dilatation which is governed by temperature rise as well as the spatial extent over which the temperature rise is observed.

  11. Discharges from nuclear power stations

    International Nuclear Information System (INIS)

    1991-02-01

    HM Inspectorate of Pollution commissioned, with authorising responsibilities in England and Wales, a study into the discharges of radioactive effluents from Nuclear Power Stations. The study considered arisings from nuclear power stations in Europe and the USA and the technologies to treat and control the radioactive discharges. This report contains details of the technologies used at many nuclear power stations to treat and control radioactive discharges and gives, where information was available, details of discharges and authorised discharge limits. (author)

  12. Status and prospects of a compact FIR FEL driven by a magnetron-based microtron

    International Nuclear Information System (INIS)

    Jeong, Young Uk; Kazakevitch, Grigori M.; Lee, Byung Cheol; Kim, Sun Kook; Cho, Sung Oh; Gavrilov, Nicolai G.; Lee, Jongmin

    2002-01-01

    A magnetron-based microtron as a driver of FIR FEL has several prominent advantages in cost, size, beam quality and operation convenience. However, it has some disadvantages due to the instability of the RF frequency and a low current. In order to overcome these disadvantages, the frequency stability of the magnetron was improved, and the interaction between the electron beam and the FIR radiation was enhanced by using a high-performance undulator and a low-loss waveguide-mode optical resonator. The FEL is now under upgrade in order to extend the wavelength range to cover 90-300 μm, which can be done by increasing the energy range of electron beam to 4.3-7 MeV. In this paper, we report the results of investigations on output characteristics of the FEL depending on cavity detuning, electron beam matching, and RF instability. Based on the results, we discuss the prospects of wide-band FIR FELs driven by magnetron-based microtrons as potent sources of radiation for scientific applications

  13. Comparative study of niobium nitride coatings deposited by unbalanced and balanced magnetron sputtering

    International Nuclear Information System (INIS)

    Olaya, J.J.; Rodil, S.E.; Muhl, S.

    2008-01-01

    Niobium nitride (NbN) coatings have many interesting properties such as chemical inertness, excellent mechanical properties, high electrical conductivity, high melting point, and a superconducting transition temperature between 16 and 17 K. For this reason, these compounds have many potential thin film applications. In this work we compare the properties of NbN x films deposited using well-characterized balanced and unbalanced magnetron sputtering systems. Samples of NbN were deposited in the two systems under almost identical deposition conditions, that is, the same substrate temperature, plasma power, gas pressure, substrate to target distance and Ar/N 2 ratio. Prior to the film preparation both the magnetic field geometry and the characteristics of the plasma were determined. The microstructure and composition of the deposits were analyzed by X-ray diffraction, scanning electron microscopy and X-ray photoelectron spectroscopy. The corrosion resistance and the micro-abrasion wear resistance were measured by anodic polarization potentiodynamic studies and by ball cratering, respectively. The NbN films grown using the highly unbalanced magnetron configuration had a preferential (111) crystal orientation and a composite hardness of up to 2400 HV 0.025 . While the films deposited using the balanced magnetron had a mixed crystalline orientation and a hardness of 2000 HV 0.025 . The results demonstrate the strong effect of magnetic field configuration on the ion bombardment, and the resultant coating characteristics

  14. Comparative study of niobium nitride coatings deposited by unbalanced and balanced magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Olaya, J.J. [Departamento de Ingenieria Mecanica y Mecatronica, Universidad Nacional de Colombia, Bogota Colombia (Colombia); Rodil, S.E. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Mexico D. F. 04510 (Mexico); Muhl, S. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Mexico D. F. 04510 (Mexico)], E-mail: muhl@servidor.unam.mx

    2008-10-01

    Niobium nitride (NbN) coatings have many interesting properties such as chemical inertness, excellent mechanical properties, high electrical conductivity, high melting point, and a superconducting transition temperature between 16 and 17 K. For this reason, these compounds have many potential thin film applications. In this work we compare the properties of NbN{sub x} films deposited using well-characterized balanced and unbalanced magnetron sputtering systems. Samples of NbN were deposited in the two systems under almost identical deposition conditions, that is, the same substrate temperature, plasma power, gas pressure, substrate to target distance and Ar/N{sub 2} ratio. Prior to the film preparation both the magnetic field geometry and the characteristics of the plasma were determined. The microstructure and composition of the deposits were analyzed by X-ray diffraction, scanning electron microscopy and X-ray photoelectron spectroscopy. The corrosion resistance and the micro-abrasion wear resistance were measured by anodic polarization potentiodynamic studies and by ball cratering, respectively. The NbN films grown using the highly unbalanced magnetron configuration had a preferential (111) crystal orientation and a composite hardness of up to 2400 HV{sub 0.025}. While the films deposited using the balanced magnetron had a mixed crystalline orientation and a hardness of 2000 HV{sub 0.025}. The results demonstrate the strong effect of magnetic field configuration on the ion bombardment, and the resultant coating characteristics.

  15. Fabrication and characterization of flaky core-shell particles by magnetron sputtering silver onto diatomite

    Science.gov (United States)

    Wang, Yuanyuan; Zhang, Deyuan; Cai, Jun

    2016-02-01

    Diatomite has delicate porous structures and various shapes, making them ideal templates for microscopic core-shell particles fabrication. In this study, a new process of magnetron sputtering assisted with photoresist positioning was proposed to fabricate lightweight silver coated porous diatomite with superior coating quality and performance. The diatomite has been treated with different sputtering time to investigate the silver film growing process on the surface. The morphologies, constituents, phase structures and surface roughness of the silver coated diatomite were analyzed with SEM, EDS, XRD and AFM respectively. The results showed that the optimized magnetron sputtering time was 8-16 min, under which the diatomite templates were successfully coated with uniform silver film, which exhibits face centered cubic (fcc) structure, and the initial porous structures were kept. Moreover, this silver coating has lower surface roughness (RMS 4.513 ± 0.2 nm) than that obtained by electroless plating (RMS 15.692 ± 0.5 nm). And the infrared emissivity of coatings made with magnetron sputtering and electroless plating silver coated diatomite can reach to the lowest value of 0.528 and 0.716 respectively.

  16. [Effects of magnetron sputtered ZrN on the bonding strength of titanium porcelain].

    Science.gov (United States)

    Zhou, Shu; Zhang, Wen-yan; Guang, Han-bing; Xia, Yang; Zhang, Fei-min

    2009-04-01

    To investigate the effect of magnetron sputtered ZrN on the bonding strength between a low-fusing porcelain (Ti/Vita titankeramik system) and commercially pure cast titanium. Sixteen specimens were randomly assigned to test group and control group (n=8). The control group received no surface treated. Magnetron sputtered ZrN film was deposited on the surface of specimens in the test group. Then the sixteen titanium-porcelain specimens were prepared in a rectangular shape and went through three-point bending test on a universal test machine. The bond strength of Ti/porcelain was recorded. The phase composition of the specimens was analyzed using X-ray diffraction (XRD). The interface at titanium and porcelain and the titanium surface after debonding were observed with a scanning electron microscopy (SEM) and analyzed using energy depressive spectrum (EDS). New phase of ZrN was found with XRD in the test group. Statistical analysis showed higher bond strength following ZrN surface treatment in the test group [(45.991+/-0.648) MPa] than that in the control group [(29.483+/-1.007) MPa] (P=0.000). Bonded ceramic could be observed in test group, the amount of bonded ceramic was more than that in the control group. No obvious bonded ceramic in control group was found. Magnetron sputtered ZrN can improve bond strength of Ti/Vita titankeramik system significantly.

  17. Computational Study on a PTAS for Planar Dominating Set Problem

    Directory of Open Access Journals (Sweden)

    Qian-Ping Gu

    2013-01-01

    Full Text Available The dominating set problem is a core NP-hard problem in combinatorial optimization and graph theory, and has many important applications. Baker [JACM 41,1994] introduces a k-outer planar graph decomposition-based framework for designing polynomial time approximation scheme (PTAS for a class of NP-hard problems in planar graphs. It is mentioned that the framework can be applied to obtain an O(2ckn time, c is a constant, (1+1/k-approximation algorithm for the planar dominating set problem. We show that the approximation ratio achieved by the mentioned application of the framework is not bounded by any constant for the planar dominating set problem. We modify the application of the framework to give a PTAS for the planar dominating set problem. With k-outer planar graph decompositions, the modified PTAS has an approximation ratio (1 + 2/k. Using 2k-outer planar graph decompositions, the modified PTAS achieves the approximation ratio (1+1/k in O(22ckn time. We report a computational study on the modified PTAS. Our results show that the modified PTAS is practical.

  18. Pulsed laser planarization of metal films for multilevel interconnects

    International Nuclear Information System (INIS)

    Tuckerman, D.B.; Schmitt, R.L.

    1985-05-01

    Multilevel interconnect schemes for integrated circuits generally require one or more planarization steps, in order to maintain an acceptably flat topography for lithography and thin-film step coverage on the higher levels. Traditional approaches have involved planarization of the interlevel insulation (dielectric) layers, either by spin-on application (e.g., polyimide), or by reflow (e.g., phosphosilicate glass). We have pursued an alternative approach, in which each metal level is melted (hence planarized) using a pulsed laser prior to patterning. Short (approx.1 μs) pulses are used to preclude undesirable metallurgical reactions between the film, adhesion or barrier layer, and dielectric layer. Laser planarization of metals is particularly well suited to multilevel systems which include ground or power planes. Results are presented for planarization of gold films on SiO 2 dielectric layers using a flashlamp-pumped dye laser. The pulse duration is approx.1 μs, which allows the heat pulse to uniformly penetrate the gold while not penetrating substantially through the underlying SiO 2 (hence not perturbing the lower levels of metal). Excellent planarization of the gold films is achieved (less than 0.1 μm surface roughness, even starting with extreme topographic variations), as well as improved conductivity. To demonstrate the process, numerous planarized two-layer structures (transmission lines under a ground plane) were fabricated and characterized. 9 refs., 2 figs

  19. Spark discharge formation in an inhomogeneous electric field under conditions of runaway electron generation

    Energy Technology Data Exchange (ETDEWEB)

    Shao Tao; Zhang Cheng; Yan Ping [Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190 (China); Key Laboratory of Power Electronics and Electric Drive, Chinese Academy of Sciences, Beijing 100190 (China); Tarasenko, Victor F.; Lomaev, Mikhail I.; Sorokin, Dmitrii A.; Kozyrev, Andrei V.; Baksht, Evgeni Kh. [Institute of High Current Electronics, Russian Academy of Sciences, Tomsk 634055 (Russian Federation)

    2012-01-15

    In this article we report on work where the formation of a spark in nanosecond high-voltage discharges was studied in nitrogen, nitrogen-methane mixtures, and air at increased pressures under the conditions of runaway electron generation. Voltage pulses of amplitude {approx}90 and {approx}250 kV were applied to a point-to-plane gap with a planar anode and a cathode of small curvature radius. Cathode spots appeared early in the discharge, within {approx}200 ps of a corona discharge at high rate of rise of the voltage ({approx}5 x 10{sup 14} V/s) across centimeter point-to-plane gap spacing. The spark leader that bridged the point-to-plane gap propagated from the planar anode with cathode spots and a voltage pulse rise time of less than 1 ns. The discharge from diffuse clouds took the form of diffuse jets with increasing pulse repetition rate, thus achieving the accumulation effect in a repetitively pulsed discharge. Characteristic emission spectra are presented for spark diffuse and corona discharges.

  20. Spark discharge formation in an inhomogeneous electric field under conditions of runaway electron generation

    International Nuclear Information System (INIS)

    Shao Tao; Zhang Cheng; Yan Ping; Tarasenko, Victor F.; Lomaev, Mikhail I.; Sorokin, Dmitrii A.; Kozyrev, Andrei V.; Baksht, Evgeni Kh.

    2012-01-01

    In this article we report on work where the formation of a spark in nanosecond high-voltage discharges was studied in nitrogen, nitrogen-methane mixtures, and air at increased pressures under the conditions of runaway electron generation. Voltage pulses of amplitude ∼90 and ∼250 kV were applied to a point-to-plane gap with a planar anode and a cathode of small curvature radius. Cathode spots appeared early in the discharge, within ∼200 ps of a corona discharge at high rate of rise of the voltage (∼5 x 10 14 V/s) across centimeter point-to-plane gap spacing. The spark leader that bridged the point-to-plane gap propagated from the planar anode with cathode spots and a voltage pulse rise time of less than 1 ns. The discharge from diffuse clouds took the form of diffuse jets with increasing pulse repetition rate, thus achieving the accumulation effect in a repetitively pulsed discharge. Characteristic emission spectra are presented for spark diffuse and corona discharges.

  1. Development of thin film cathodes for lithium-ion batteries in the material system Li–Mn–O by r.f. magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Fischer, J., E-mail: julian.fischer@kit.edu [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials, Applied Materials Physics (IAM-AWP), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Adelhelm, C.; Bergfeldt, T. [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials, Applied Materials Physics (IAM-AWP), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Chang, K. [RWTH Aachen University, Materials Chemistry, Kopernikusstrasse 10, 46 52074 Aachen (Germany); Ziebert, C.; Leiste, H.; Stüber, M.; Ulrich, S. [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials, Applied Materials Physics (IAM-AWP), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Music, D.; Hallstedt, B. [RWTH Aachen University, Materials Chemistry, Kopernikusstrasse 10, 46 52074 Aachen (Germany); Seifert, H.J. [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials, Applied Materials Physics (IAM-AWP), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany)

    2013-01-01

    Today most commercially available lithium ion batteries are still based on the toxic and expensive LiCoO{sub 2} as a standard cathode material. However, lithium manganese based cathode materials are cheaper and environmentally friendlier. In this work cubic-LiMn{sub 2}O{sub 4} spinel, monoclinic-Li{sub 2}MnO{sub 3} and orthorhombic-LiMnO{sub 2} thin films have been synthesized by non-reactive r.f. magnetron sputtering from two ceramic targets (LiMn{sub 2}O{sub 4}, LiMnO{sub 2}) in a pure argon discharge. The deposition parameters, namely target power and working gas pressure, were optimized in a combination with a post deposition heat treatment with respect to microstructure and electrochemical behavior. The chemical composition was determined using inductively coupled plasma optical emission spectroscopy and carrier gas hot extraction. The films' crystal structure, phase evolution and morphology were investigated by X-ray diffraction, micro Raman spectroscopy and scanning electron microscopy. Due to the fact that these thin films consist of the pure active material without any impurities, such as binders or conductive additives like carbon black, they are particularly well suited for measurements of the intrinsic physical properties, which is essential for fundamental understanding. The electrochemical behavior of the cubic and the orthorhombic films was investigated by galvanostatic cycling in half cells against metallic lithium. The cubic spinel films exhibit a maximum specific capacity of ∼ 82 mAh/g, while a specific capacity of nearly 150 mAh/g can be reached for the orthorhombic counterparts. These films are promising candidates for future all solid state battery applications. - Highlights: ► Synthesis of 3 Li–Mn–O structures by one up-scalable thin film deposition method ► Formation of o-LiMnO{sub 2} by r.f. magnetron sputtering in combination with post-annealing ► Discharge capacity with o-LiMnO{sub 2} cathodes twice as high as for c

  2. Development of thin film cathodes for lithium-ion batteries in the material system Li–Mn–O by r.f. magnetron sputtering

    International Nuclear Information System (INIS)

    Fischer, J.; Adelhelm, C.; Bergfeldt, T.; Chang, K.; Ziebert, C.; Leiste, H.; Stüber, M.; Ulrich, S.; Music, D.; Hallstedt, B.; Seifert, H.J.

    2013-01-01

    Today most commercially available lithium ion batteries are still based on the toxic and expensive LiCoO 2 as a standard cathode material. However, lithium manganese based cathode materials are cheaper and environmentally friendlier. In this work cubic-LiMn 2 O 4 spinel, monoclinic-Li 2 MnO 3 and orthorhombic-LiMnO 2 thin films have been synthesized by non-reactive r.f. magnetron sputtering from two ceramic targets (LiMn 2 O 4 , LiMnO 2 ) in a pure argon discharge. The deposition parameters, namely target power and working gas pressure, were optimized in a combination with a post deposition heat treatment with respect to microstructure and electrochemical behavior. The chemical composition was determined using inductively coupled plasma optical emission spectroscopy and carrier gas hot extraction. The films' crystal structure, phase evolution and morphology were investigated by X-ray diffraction, micro Raman spectroscopy and scanning electron microscopy. Due to the fact that these thin films consist of the pure active material without any impurities, such as binders or conductive additives like carbon black, they are particularly well suited for measurements of the intrinsic physical properties, which is essential for fundamental understanding. The electrochemical behavior of the cubic and the orthorhombic films was investigated by galvanostatic cycling in half cells against metallic lithium. The cubic spinel films exhibit a maximum specific capacity of ∼ 82 mAh/g, while a specific capacity of nearly 150 mAh/g can be reached for the orthorhombic counterparts. These films are promising candidates for future all solid state battery applications. - Highlights: ► Synthesis of 3 Li–Mn–O structures by one up-scalable thin film deposition method ► Formation of o-LiMnO 2 by r.f. magnetron sputtering in combination with post-annealing ► Discharge capacity with o-LiMnO 2 cathodes twice as high as for c-LiMn 2 O 4 ► Thin film deposition of m-Li 2 MnO 3 and

  3. Recent Studies on the Aromaticity and Antiaromaticity of Planar Cyclooctatetraene

    Directory of Open Access Journals (Sweden)

    Masahiko Iyoda

    2010-02-01

    Full Text Available Cyclooctatetraene (COT, the first 4nπ-electron system to be studied, adopts an inherently nonplanar tub-shaped geometry of D2d symmetry with alternating single and double bonds, and hence behaves as a nonaromatic polyene rather than an antiaromatic compound. Recently, however, considerable 8π-antiaromatic paratropicity has been shown to be generated in planar COT rings even with the bond alternated D4h structure. In this review, we highlight recent theoretical and experimental studies on the antiaromaticity of hypothetical and actual planar COT. In addition, theoretically predicted triplet aromaticity and stacked aromaticity of planar COT are also briefly described.

  4. Optimal External-Memory Planar Point Enclosure

    DEFF Research Database (Denmark)

    Arge, Lars; Samoladas, Vasilis; Yi, Ke

    2007-01-01

    .g. spatial and temporal databases, and is dual to the important and well-studied orthogonal range searching problem. Surprisingly, despite the fact that the problem can be solved optimally in internal memory with linear space and O(log N+K) query time, we show that one cannot construct a linear sized......In this paper we study the external memory planar point enclosure problem: Given N axis-parallel rectangles in the plane, construct a data structure on disk (an index) such that all K rectangles containing a query point can be reported I/O-efficiently. This problem has important applications in e...... external memory point enclosure data structure that can be used to answer a query in O(log  B N+K/B) I/Os, where B is the disk block size. To obtain this bound, Ω(N/B 1−ε ) disk blocks are needed for some constant ε>0. With linear space, the best obtainable query bound is O(log 2 N+K/B) if a linear output...

  5. Development of cofired type planar SOFC

    Energy Technology Data Exchange (ETDEWEB)

    Taira, Hiroaki; Sakamoto, Sadaaki; Zhou, Hua-Bing [Murata Manufacturing Co., Ltd., Shiga (Japan)] [and others

    1996-12-31

    We have developed fabrication process for planar SOFC fabricated with cofired anode/electrolyte/cathode multilayers and interconnects. By cofiring technique for the multilayers, we expect to reduce the thickness of the electrolyte layers, resulting in decrease of innerimpedance, and achieve low production cost. On the other hand, the cofiring technique requires that the sintering temperature, the shrinkage profiles and the thermal expansion characteristics of all component materials should be compatible with the other. It is, therefore, difficult to cofire the multilayers with large area. Using the multilayers with surface area of 150cm{sup 2}, we fabricated the multiple cell stacks. The maximum power of 5x4 multiple cell stack (5 planes of cells in series, 4 cells in parallel in each planes 484cm{sup 2} effective electrode area of each cell planes) was 601W (0.25Wcm{sup -2}, Uf=40%). However, the terminal voltage of the multiple cell stack decreased by the cause of cell cracking, gas leakage and degradation of cofired multilayers. This paper presents the improvements of cofired multilayers, and the performance of multiple cell stacks with the improved multilayers.

  6. Transfer matrix representation for periodic planar media

    Science.gov (United States)

    Parrinello, A.; Ghiringhelli, G. L.

    2016-06-01

    Sound transmission through infinite planar media characterized by in-plane periodicity is faced by exploiting the free wave propagation on the related unit cells. An appropriate through-thickness transfer matrix, relating a proper set of variables describing the acoustic field at the two external surfaces of the medium, is derived by manipulating the dynamic stiffness matrix related to a finite element model of the unit cell. The adoption of finite element models avoids analytical modeling or the simplification on geometry or materials. The obtained matrix is then used in a transfer matrix method context, making it possible to combine the periodic medium with layers of different nature and to treat both hard-wall and semi-infinite fluid termination conditions. A finite sequence of identical sub-layers through the thickness of the medium can be handled within the transfer matrix method, significantly decreasing the computational burden. Transfer matrices obtained by means of the proposed method are compared with analytical or equivalent models, in terms of sound transmission through barriers of different nature.

  7. Planar screening by charge polydisperse counterions

    Science.gov (United States)

    Trulsson, M.; Trizac, E.; Šamaj, L.

    2018-01-01

    We study how a neutralising cloud of counterions screens the electric field of a uniformly charged planar membrane (plate), when the counterions are characterised by a distribution of charges (or valence), n(q) . We work out analytically the one-plate and two-plate cases, at the level of non-linear Poisson-Boltzmann theory. The (essentially asymptotic) predictions are successfully compared to numerical solutions of the full Poisson-Boltzmann theory, but also to Monte Carlo simulations. The counterions with smallest valence control the long-distance features of interactions, and may qualitatively change the results pertaining to the classic monodisperse case where all counterions have the same charge. Emphasis is put on continuous distributions n(q) , for which new power-laws can be evidenced, be it for the ionic density or the pressure, in the one- and two-plates situations respectively. We show that for discrete distributions, more relevant for experiments, these scaling laws persist in an intermediate but yet observable range. Furthermore, it appears that from a practical point of view, hallmarks of the continuous n(q) behaviour are already featured by discrete mixtures with a relatively small number of constituents.

  8. Planar optical waveguide sensor of ammonia

    Science.gov (United States)

    Sarkisov, Sergey S.; Curley, Michael J.; Boykin, Courtney; Diggs, Darnell E.; Grote, James G.; Hopkins, Frank K.

    2004-12-01

    We describe a novel sensor of ammonia based on a planar optical waveguide made of a thin film of polymer polyimide doped with indicator dye bromocresol purple. The film of dye-doped polyimide demonstrated reversible increase of absorption with a peak near 600 nm in response to presence of ammonia in ambient air. Coupling of input and output optic fibers with the waveguide was done by means of coupling prisms or coupling grooves. The latter configuration has the advantage of low cost, less sensitivity to temperature variation, and the possibility of coupling from both sides of the waveguide. Special experimental setup was built to test the sensor. It included test gas chamber with sealed optic fiber feed-throughs, gas filling line, laser source, photodetector, and signal processing hardware and software. The sensor was capable of detecting 100 ppm of ammonia in air within 8 seconds. Further increase of sensitivity can be achieved by adding more dye dopant to the polymer, increase of the length of the waveguide, and suppression of noise. Overexposure of the sensor to more than 5000 ppm of ammonia led to the saturation of the polymer film and, as a result, significant decrease of sensitivity and increase of the response time. The sensor can be used as low cost component of a distributed optical network of chemical sensors for monitoring presence of hazardous industrial pollutants in air.

  9. Stress measurements of planar dielectric elastomer actuators

    International Nuclear Information System (INIS)

    Osmani, Bekim; Aeby, Elise A.; Müller, Bert

    2016-01-01

    Dielectric elastomer actuator (DEA) micro- and nano-structures are referred to artificial muscles because of their specific continuous power and adequate time response. The bending measurement of an asymmetric, planar DEA is described. The asymmetric cantilevers consist of 1 or 5 μm-thin DEAs deposited on polyethylene naphthalate (PEN) substrates 16, 25, 38, or 50 μm thick. The application of a voltage to the DEA electrodes generates an electrostatic pressure in the sandwiched silicone elastomer layer, which causes the underlying PEN substrate to bend. Optical beam deflection enables the detection of the bending angle vs. applied voltage. Bending radii as large as 850 m were reproducibly detected. DEA tests with electric fields of up to 80 V/μm showed limitations in electrode’s conductivity and structure failures. The actuation measurement is essential for the quantitative characterization of nanometer-thin, low-voltage, single- and multi-layer DEAs, as foreseen for artificial sphincters to efficiently treat severe urinary and fecal incontinence.

  10. Stress transmission in planar disordered solid foams

    International Nuclear Information System (INIS)

    Blumenfeld, Raphael

    2003-01-01

    Stress transmission in planar open-cell cellular solids is analysed using a recent theory developed for marginally rigid granular assemblies. This is made possible by constructing a one-to-one mapping between the two systems. General trivalent networks are mapped onto assemblies of rough grains, while networks where Plateau rules are observed, are mapped onto assemblies of smooth grains. The constitutive part of the stress transmission equations couples the stress directly to the local rotational disorder of the cellular structure via a new fabric tensor. An intriguing consequence of the analysis is that the stress field can be determined in terms of the microstructure alone independent of stress-strain information. This redefines the problem of structure-property relationship in these materials and poses questions on the relations between this formalism and elasticity theory. The deviation of the stress transmission equations from those of conventional solids has been interpreted in the context of granular assemblies as a new state of solid matter and the relevance of this interpretation to the state of matter of cellular solids is discussed

  11. Stress measurements of planar dielectric elastomer actuators

    Energy Technology Data Exchange (ETDEWEB)

    Osmani, Bekim; Aeby, Elise A.; Müller, Bert [Biomaterials Science Center, University of Basel, Gewerbestrasse 14, 4123 Allschwil (Switzerland)

    2016-05-15

    Dielectric elastomer actuator (DEA) micro- and nano-structures are referred to artificial muscles because of their specific continuous power and adequate time response. The bending measurement of an asymmetric, planar DEA is described. The asymmetric cantilevers consist of 1 or 5 μm-thin DEAs deposited on polyethylene naphthalate (PEN) substrates 16, 25, 38, or 50 μm thick. The application of a voltage to the DEA electrodes generates an electrostatic pressure in the sandwiched silicone elastomer layer, which causes the underlying PEN substrate to bend. Optical beam deflection enables the detection of the bending angle vs. applied voltage. Bending radii as large as 850 m were reproducibly detected. DEA tests with electric fields of up to 80 V/μm showed limitations in electrode’s conductivity and structure failures. The actuation measurement is essential for the quantitative characterization of nanometer-thin, low-voltage, single- and multi-layer DEAs, as foreseen for artificial sphincters to efficiently treat severe urinary and fecal incontinence.

  12. Double shell planar experiments on OMEGA

    Science.gov (United States)

    Dodd, E. S.; Merritt, E. C.; Palaniyappan, S.; Montgomery, D. S.; Daughton, W. S.; Schmidt, D. W.; Cardenas, T.; Wilson, D. C.; Loomis, E. N.; Batha, S. H.; Ping, Y.; Smalyuk, V. A.; Amendt, P. A.

    2017-10-01

    The double shell project is aimed at fielding neutron-producing capsules at the National Ignition Facility (NIF), in which an outer low-Z ablator collides with an inner high-Z shell to compress the fuel. However, understanding these targets experimentally can be challenging when compared with conventional single shell targets. Halfraum-driven planar targets at OMEGA are being used to study physics issues important to double shell implosions outside of a convergent geometry. Both VISAR and radiography through a tube have advantages over imaging through the hohlraum and double-shell capsule at NIF. A number physics issues are being studied with this platform that include 1-d and higher dimensional effects such as defect-driven hydrodynamic instabilities from engineering features. Additionally, the use of novel materials with controlled density gradients require study in easily diagnosed 1-d systems. This work ultimately feeds back into the NIF capsule platform through manufacturing tolerances set using data from OMEGA. Supported under the US DOE by the LANS, LLC under contract DE-AC52-06NA25396. LA-UR-17-25386.

  13. Massive planar and non-planar double box integrals for light N f contributions to

    Science.gov (United States)

    von Manteuffel, Andreas; Studerus, Cedric

    2013-10-01

    We present the master integrals needed for the light fermionic two-loop corrections to top quark pair production in the gluon fusion channel. Via the method of differential equations we compute the results in terms of multiple polylogarithms in a Laurent series about d = 4, where d is the space-time dimension. The most involved topology is a non-planar double box with one internal mass. We employ the coproduct-augmented symbol calculus and show that significant simplifications are possible for selected results using an optimised set of multiple polylogarithms.

  14. Vessel Sewage Discharges: No-Discharge Zones (NDZs)

    Science.gov (United States)

    States may petition the EPA to establish areas, called no discharge zones (NDZs), where vessel sewage discharges are prohibited. This page describes how NDZs are designated, the types of designations, who enforces them, and how to comply.

  15. Monitoring of lightning discharge

    International Nuclear Information System (INIS)

    Grigor'ev, V.A.

    2001-01-01

    The paper presents a brief description of a lightning discharge recording system developed at the NPO 'Monitoring Techniques' under the direction of V.M. Moskolenko (Moscow). The system provides information about dangerous environmental occurrences such as tornados and hurricanes, making the forecast of extreme situations possible, especially in the areas of dangerous industries and objects. The created automatic system can be useful in solving the tasks relating to nuclear test monitoring. (author)

  16. Underwater Ship Husbandry Discharges

    Science.gov (United States)

    2011-11-01

    which entered into force in September of 2008, prohibits the use of harmful organotins such as tributyltin ( TBT ) in AFCs used on international...States. The use of TBT AFCs is explicitly prohibited under the VGP, and vessels must remove such coatings or paint over them to prevent toxic ...to hull husbandry include (1) the discharge of toxic chemicals used as biocides in AFCs and (2) biofouling as a vector for aquatic nuisance species

  17. Radioactive wastes and discharges

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2000-07-01

    The guide sets out the radiation safety requirements and limits for the treatment of radioactive waste. They shall be observed when discharging radioactive substances into the atmosphere or sewer system, or when delivering solid, low-activity waste to a landfill site without a separate waste treatment plan. The guide does not apply to the radioactive waste resulting from the utilisation of nuclear energy or natural resources.

  18. Radioactive wastes and discharges

    International Nuclear Information System (INIS)

    2000-01-01

    The guide sets out the radiation safety requirements and limits for the treatment of radioactive waste. They shall be observed when discharging radioactive substances into the atmosphere or sewer system, or when delivering solid, low-activity waste to a landfill site without a separate waste treatment plan. The guide does not apply to the radioactive waste resulting from the utilisation of nuclear energy or natural resources

  19. Non-existence of limit cycles for planar vector fields

    Directory of Open Access Journals (Sweden)

    Jaume Gine

    2014-03-01

    Full Text Available This article presents sufficient conditions for the non-existence of limit cycles for planar vector fields. Classical methods for the nonexistence of limit cycles are connected with the theory developed here.

  20. Perovskite-fullerene hybrid materials suppress hysteresis in planar diodes.

    KAUST Repository

    Xu, Jixian; Buin, Andrei; Ip, Alexander H; Li, Wei; Voznyy, Oleksandr; Comin, Riccardo; Yuan, Mingjian; Jeon, Seokmin; Ning, Zhijun; McDowell, Jeffrey J; Kanjanaboos, Pongsakorn; Sun, Jon-Paul; Lan, Xinzheng; Quan, Li Na; Kim, Dong Ha; Hill, Ian G; Maksymovych, Peter; Sargent, Edward H

    2015-01-01

    passivates the key PbI3(-) antisite defects during the perovskite self-assembly, as revealed by theory and experiment. Photoluminescence transient spectroscopy proves that the PCBM phase promotes electron extraction. We showcase this mixed material in planar

  1. Helical-axis stellarators with noninterlocking planar coils

    International Nuclear Information System (INIS)

    Reiman, A.; Boozer, A.

    1983-08-01

    The properties of helical axis stellarator fields generated by unlinked, planar coils are described. It is shown that such fields can have a magnetic well and large rotational transform, implying large equilibrium and stability beta limits

  2. Helical-axis stellarators with noninterlocking planar coils

    Energy Technology Data Exchange (ETDEWEB)

    Reiman, A.; Boozer, A.

    1983-08-01

    The properties of helical axis stellarator fields generated by unlinked, planar coils are described. It is shown that such fields can have a magnetic well and large rotational transform, implying large equilibrium and stability beta limits.

  3. Principles of planar near-field antenna measurements

    CERN Document Server

    Gregson, Stuart; Parini, Clive

    2007-01-01

    This single volume provides a comprehensive introduction and explanation of both the theory and practice of 'Planar Near-Field Antenna Measurement' from its basic postulates and assumptions, to the intricacies of its deployment in complex and demanding measurement scenarios.

  4. Nonlinear Saturation Amplitude in Classical Planar Richtmyer–Meshkov Instability

    International Nuclear Information System (INIS)

    Liu Wan-Hai; Jiang Hong-Bin; Ma Wen-Fang; Wang Xiang

    2016-01-01

    The classical planar Richtmyer–Meshkov instability (RMI) at a fluid interface supported by a constant pressure is investigated by a formal perturbation expansion up to the third order, and then according to definition of nonlinear saturation amplitude (NSA) in Rayleigh–Taylor instability (RTI), the NSA in planar RMI is obtained explicitly. It is found that the NSA in planar RMI is affected by the initial perturbation wavelength and the initial amplitude of the interface, while the effect of the initial amplitude of the interface on the NSA is less than that of the initial perturbation wavelength. Without marginal influence of the initial amplitude, the NSA increases linearly with wavelength. The NSA normalized by the wavelength in planar RMI is about 0.11, larger than that corresponding to RTI. (paper)

  5. Determination of plasma density from data on the ion current to cylindrical and planar probes

    Energy Technology Data Exchange (ETDEWEB)

    Voloshin, D. G., E-mail: dvoloshin@mics.msu.su; Vasil’eva, A. N.; Kovalev, A. S.; Mankelevich, Yu. A.; Rakhimova, T. V. [Moscow State University, Skobeltsyn Nuclear Physics Institute (Russian Federation)

    2016-12-15

    To improve probe methods of plasma diagnostics, special probe measurements were performed and numerical models describing ion transport to a probe with allowance for collisions were developed. The current–voltage characteristics of cylindrical and planar probes were measured in an RF capacitive discharge in argon at a frequency of 81 MHz and plasma densities of 10{sup 10}–10{sup 11} cm{sup –3}, typical of modern RF reactors. 1D and 2D numerical models based on the particle-in-cell method with Monte Carlo collisions for simulating ion motion and the Boltzmann equilibrium for electrons are developed to describe current collection by a probe. The models were used to find the plasma density from the ion part of the current–voltage characteristic, study the effect of ion collisions, and verify simplified approaches to determining the plasma density. A 1D hydrodynamic model of the ion current to a cylindrical probe with allowance for ion collisions is proposed. For a planar probe, a method to determine the plasma density from the averaged numerical results is developed. A comparative analysis of different approaches to calculating the plasma density from the ion current to a probe is performed.

  6. Experimental studies of microwave interaction with a plasma-covered planar conducting surface

    International Nuclear Information System (INIS)

    Destler, W.W.; Rodgers, J.; DeGrange, J.E.; Segalov, Z.

    1990-01-01

    The authors present experimental studies of the reflection and absorption of microwave radiation from a plasma-covered planar conducting surface. In the experiments, microwave radiation from both highpower, short pulse (10 GHz, 100 MW, 30 ns) and low power (10 GHz, 10 mW, CW) sources is radiated at a 30 cm diameter conducting plate. A time-varying plasma is created on the surface of the conductor by 19 coaxial plasma guns embedded in the surface of the plate and discharged using a fast-rise capacitor bank. The plasma density distribution on the conducting surface is a function of time and the charging voltage on the capacitor bank. Incident and reflected microwave radiation has been measured for a wide variety of experimental conditions

  7. Numerical Analysis Of Buckling Of Von Mises Planar Truss

    Directory of Open Access Journals (Sweden)

    Kalina Martin

    2015-12-01

    Full Text Available A computational algorithm of a discrete model of von Mises planar steel truss is presented. The structure deformation is evaluated by seeking the minimal potential energy. The critical force invented by mathematical solution was compared with solution by computer algorithm. Symmetric and asymmetric effects of initial shape of geometric imperfection of axis of struts are used in model. The shapes of buckling of von Mises planar truss of selected vertical displacement of top joint are shown.

  8. Flat panel planar optic display. Revision 4/95

    Energy Technology Data Exchange (ETDEWEB)

    Veligdan, J.T.

    1995-05-01

    A prototype 10 inch flat panel Planar Optic display, (POD), screen has been constructed and tested. This display screen is comprised of hundreds of planar optic glass sheets bonded together with a cladding layer between each sheet where each glass sheet represents a vertical line of resolution. The display is 9 inches wide by 5 inches high and approximately 1 inch thick. A 3 milliwatt HeNe laser is used as the illumination source and a vector scanning technique is employed.

  9. On the maximum number of cycles in a planar graph

    DEFF Research Database (Denmark)

    Aldred, R.E.L.; Thomassen, Carsten

    2008-01-01

    Let G be a graph on p vertices with q edges and let r = q - p + 1. We show that G has at most 15/162(r) cycles. We also show that if G is planar, then G has at most 2(r-1) + o(2(r-1)) cycles. The planar result is best possible in the sense that any prism, that is, the Cartesian product of a cycle...... and a path with one edge, has more than 2(r-1) cycles....

  10. Surfaces foliated by planar geodesics: a model forcurved wood design

    DEFF Research Database (Denmark)

    Brander, David; Gravesen, Jens

    2017-01-01

    Surfaces foliated by planar geodesics are a natural model for surfaces made from wood strips. We outline how to construct all solutions, and produce non-trivial examples, such as a wood-strip Klein bottle......Surfaces foliated by planar geodesics are a natural model for surfaces made from wood strips. We outline how to construct all solutions, and produce non-trivial examples, such as a wood-strip Klein bottle...

  11. $1$-string $B_2$-VPG representation of planar graphs

    Directory of Open Access Journals (Sweden)

    Therese Biedl

    2016-09-01

    Full Text Available In this paper, we prove that every planar graph has a 1-string $B_2$-VPG representation—a string representation using paths in a rectangular grid that contain at most two bends. Furthermore, two paths representing vertices $u,v$ intersect precisely once whenever there is an edge between $u$ and $v$. We also show that only a subset of the possible curve shapes is necessary to represent $4$-connected planar graphs.

  12. Group theoretical construction of planar noncommutative phase spaces

    Energy Technology Data Exchange (ETDEWEB)

    Ngendakumana, Ancille, E-mail: nancille@yahoo.fr; Todjihoundé, Leonard, E-mail: leonardt@imsp.uac.org [Institut de Mathématiques et des Sciences Physiques (IMSP), Porto-Novo (Benin); Nzotungicimpaye, Joachim, E-mail: kimpaye@kie.ac.rw [Kigali Institute of Education (KIE), Kigali (Rwanda)

    2014-01-15

    Noncommutative phase spaces are generated and classified in the framework of centrally extended anisotropic planar kinematical Lie groups as well as in the framework of noncentrally abelian extended planar absolute time Lie groups. Through these constructions the coordinates of the phase spaces do not commute due to the presence of naturally introduced fields giving rise to minimal couplings. By symplectic realizations methods, physical interpretations of generators coming from the obtained structures are given.

  13. Group theoretical construction of planar noncommutative phase spaces

    International Nuclear Information System (INIS)

    Ngendakumana, Ancille; Todjihoundé, Leonard; Nzotungicimpaye, Joachim

    2014-01-01

    Noncommutative phase spaces are generated and classified in the framework of centrally extended anisotropic planar kinematical Lie groups as well as in the framework of noncentrally abelian extended planar absolute time Lie groups. Through these constructions the coordinates of the phase spaces do not commute due to the presence of naturally introduced fields giving rise to minimal couplings. By symplectic realizations methods, physical interpretations of generators coming from the obtained structures are given

  14. Development of a Magnetron Resonance Frequency Auto Tuning System for Medical Xband [9300 MHz] RF Linear Accelerator

    Energy Technology Data Exchange (ETDEWEB)

    Cha, Sung Su; Lee, Byung Cheol [University of Science and Technology, Daejeon (Korea, Republic of); Kim, Yujong; Park, Hyung Dal; Lee, Byeong-No; Joo, Youngwoo; Cha, Hyungki; Lee, Soo Min; Song, Ki Baek [KAERI, Daejeon (Korea, Republic of); Lee, Seung Hyun [Sungkyunkwan University, Suwon (Korea, Republic of)

    2015-05-15

    The total components of the accelerator are the magnetron, electron gun, accelerating structure, a set of solenoid magnets, four sets of steering coils, a modulator, and a circulator. One of the accelerator components of the accelerating structure is made of oxygen-free high-conductivity copper (OFHC), and its volume is changed according to the ambient temperature. As the volume changes, the resonant frequency of the accelerating structure is changed. Accordingly, the resonance frequency is mismatched between the source of the magnetron and the accelerating structure. An automatic frequency tuning system is automatically matched with the resonant frequency of the magnetron and accelerating structure, which allows a high output power and reliable accelerator operation. An automatic frequency tuning system is composed of a step motor control part for correcting the frequency of the source and power measuring parts, i.e., the forward and reflected power between the magnetron and accelerating structure. In this paper, the design, fabrication, and RF power test of the automatic frequency tuning system for the X-band linac are presented. A frequency tuning system was developed to overcome an unstable accelerator operation owing to the frequency mismatch between the magnetron and accelerating structure. The frequency measurement accuracy is 100 kHz and 0.72 degree per pulse.

  15. The value of filtered planar images in pediatric DMSA scans

    International Nuclear Information System (INIS)

    Mohammed, A.M.; Naddaf, S.Y.; Elgazzar, A.H.; Al-Abdul Salam, A.A.; Omar, A.A.

    2006-01-01

    The study was designed to demonstrate the value of filtered planar images in paediatric DMSA scanning. One hundred and seventy three patients ranged in age from 15 days to 12 years (mean: 4.3 years) with urinary tract infection (UTI) and clinical and/or laboratory suspicion of acute pyelonephritis (APN) were retrospectively studied. Planar images were filtered using Butterworth filter. The scan findings were reported as positive, negative or equivocal for cortical defects. Each scan was read in a double-blind fashion by two nuclear medicine physicians to evaluate inter-observer variations. Each kidney was divided into three zones, upper, middle and lower, and each zone was graded as positive, negative or equivocal for the presence of renal defects. Renal cortical defects were found in 66 patients (91 kidneys and 186 zones) with filtered images, 58 patients (81 kidneys and 175 zones) with planar images, and 69 patients (87 kidneys and 180 zones) with SPECT images. McNemar's test revealed statistically significant difference between filtered and planar images (p=0.038 for patients, 0.021 for kidneys and 0.034 for number of zones). Inter-observer agreement was 0.877 for filtered images, 0.915 for planar images and 0.915 for SPECT images. It was concluded that filtered planar images of renal cortex are comparable to SPECT images and can be used effectively in place of SPECT, when required, to shorten imaging time and eliminate motion artifacts, especially in the paediatric population. (author)

  16. Deposition and characterization of TaAIN thin films by reactive magnetron sputtering; Deposicao e caracterizacao de filmes finos de TaAIN depositados por magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Oliveira, G.B.; Fernandez, D.R.; Fontes Junior, A.S.; Felix, L.C.; Tentardini, E.K. [Universidade Federal de Sergipe (UFS), Sao Cristovao, SE (Brazil). Departamento de Ciencia e Engenharia de Materiais; Hubler, R. [Pontificia Universidade Catolica do Rio Grande do Sul (PUC-RS), RS (Brazil); Silva Junior, A.H. da, E-mail: brito-g@hotmail.com [Universidade Federal do Rio Grande do Sul (UFRGS), RS (Brazil)

    2016-07-01

    Phase stability, oxidation resistance and great mechanical properties are the main objectives when synthesizing protective coatings. The tantalum nitride (TaN) has aroused interest because of its high temperature stability, chemical inertness and thermal conductivity. However, it has a low hardness value when compared to other coatings. Researches has shown that one way to improvements in the properties of a thin film is by adding other elements in the deposition process. Therefore, the objective of this study was to deposit thin films of TaAlN by magnetron sputtering, changing the aluminum concentration of 2, 5, 7, to 14%. Then the coatings were characterized by EDS, RBS, GIXRD and nanohardness. In this study was found that the aluminum deposited did not change the oxidation resistance of the coating, and the highest value of hardness was 28 GPa for the sample with 14 at.%. (author)

  17. Plasma Discharge Process in a Pulsed Diaphragm Discharge System

    Science.gov (United States)

    Duan, Jianjin; Hu, Jue; Zhang, Chao; Wen, Yuanbin; Meng, Yuedong; Zhang, Chengxu

    2014-12-01

    As one of the most important steps in wastewater treatment, limited study on plasma discharge process is a key challenge in the development of plasma applications. In this study, we focus on the plasma discharge process of a pulsed diaphragm discharge system. According to the analysis, the pulsed diaphragm discharge proceeds in seven stages: (1) Joule heating and heat exchange stage; (2) nucleated site formation; (3) plasma generation (initiation of the breakdown stage); (4) avalanche growth and plasma expansion; (5) plasma contraction; (6) termination of the plasma discharge; and (7) heat exchange stage. From this analysis, a critical voltage criterion for breakdown is obtained. We anticipate this finding will provide guidance for a better application of plasma discharges, especially diaphragm plasma discharges.

  18. Quality control on planar n-in-n pixel sensors — Recent progress of ATLAS planar pixel sensors

    International Nuclear Information System (INIS)

    Klingenberg, R.

    2013-01-01

    To extend the physics reach of the Large Hadron Collider (LHC), upgrades to the accelerator are planned which will increase the peak luminosity by a factor 5–10. To cope with the increased occupancy and radiation damage, the ATLAS experiment plans to introduce an all-silicon inner tracker with the high luminosity upgrade (HL-LHC). To investigate the suitability of pixel sensors using the proven planar technology for the upgraded tracker, the ATLAS Upgrade Planar Pixel Sensor (PPS) R and D Project was established. Main areas of research are the performance of planar pixel sensors at highest fluences, the exploration of possibilities for cost reduction to enable the instrumentation of large areas, the achievement of slim or active edges to provide low geometric inefficiencies without the need for shingling of modules and the investigation of the operation of highly irradiated sensors at low thresholds to increase the efficiency. The Insertable b-layer (IBL) is the first upgrade project within the ATLAS experiment and will employ a new detector layer consisting of silicon pixel sensors, which were improved and prototyped in the framework of the planar pixel sensor R and D project. A special focus of this paper is the status of the development and testing of planar n-in-n pixel sensors including the quality control of the on-going series production and postprocessing of sensor wafers. A high yield of produced planar sensor wafers and FE-I4 double chip sensors after first steps of post-processing including under bump metallization and dicing is observed. -- Highlights: ► Prototypes of irradiated planar n-in-n sensors have been successfully tested under laboratory conditions. ► A quality assurance programme on the series production of planar sensors for the IBL has started. ► A high yield of double chip sensors during the series production is observed which are compatible to the specifications to this detector component.

  19. Translational, rotational, vibrational and electron temperatures of a gliding arc discharge

    DEFF Research Database (Denmark)

    Zhu, Jiajian; Ehn, Andreas; Gao, Jinlong

    2017-01-01

    , 0) band was used to simulate the rotational temperature (Tr) of the gliding arc discharge whereas the NO A–X (1, 0) and (0, 1) bands were used to determine its vibrational temperature (Tv). The instantaneous reduced electric field strength E/N was obtained by simultaneously measuring......Translational, rotational, vibrational and electron temperatures of a gliding arc discharge in atmospheric pressure air were experimentally investigated using in situ, non-intrusive optical diagnostic techniques. The gliding arc discharge was driven by a 35 kHz alternating current (AC) power source...... and operated in a glow-type regime. The two-dimensional distribution of the translational temperature (Tt) of the gliding arc discharge was determined using planar laser-induced Rayleigh scattering. The rotational and vibrational temperatures were obtained by simulating the experimental spectra. The OH A–X (0...

  20. Compact Intracloud Discharges

    Energy Technology Data Exchange (ETDEWEB)

    Smith, David A. [Univ. of Colorado, Boulder, CO (United States)

    1998-11-01

    In November of 1993, mysterious signals recorded by a satellite-borne broadband VHF radio science experiment called Blackboard led to a completely unexpected discovery. Prior to launch of the ALEXIS satellite, it was thought that its secondary payload, Blackboard, would most often detect the radio emissions from lightning when its receiver was not overwhelmed by noise from narrowband communication carriers. Instead, the vast majority of events that triggered the instrument were isolated pairs of pulses that were one hundred times more energetic than normal thunderstorm electrical emissions. The events, which came to be known as TIPPs (for transionospheric pulse pairs), presented a true mystery to the geophysics community. At the time, it was not even known whether the events had natural or anthropogenic origins. After two and one half years of research into the unique signals, two ground-based receiver arrays in New Mexico first began to detect and record thunderstorm radio emissions that were consistent with the Blackboard observations. On two occasions, the ground-based systems and Blackboard even recorded emissions that were produced by the same exact events. From the ground based observations, it has been determined that TIPP events areproduced by brief, singular, isolated, intracloud electrical discharges that occur in intense regions of thunderstorms. These discharges have been dubbed CIDS, an acronym for compact intracloud discharges. During the summer of 1996, ground-based receiver arrays were used to record the electric field change signals and broadband HF emissions from hundreds of CIDS. Event timing that was accurate to within a few microseconds made possible the determination of source locations using methods of differential time of arrival. Ionospheric reflections of signals were recorded in addition to groundwave/line-of-sight signals and were used to determine accurate altitudes for the discharges. Twenty-four CIDS were recorded from three