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Sample records for p-type czochralski silicon

  1. Microhardness of carbon-doped (111) p-type Czochralski silicon

    Science.gov (United States)

    Danyluk, S.; Lim, D. S.; Kalejs, J.

    1985-01-01

    The effect of carbon on (111) p-type Czochralski silicon is examined. The preparation of the silicon and microhardness test procedures are described, and the equation used to determine microhardness from indentations in the silicon wafers is presented. The results indicate that as the carbon concentration in the silicon increases the microhardness increases. The linear increase in microhardness is the result of carbon hindering dislocation motion, and the effect of temperature on silicon deformation and dislocation mobility is explained. The measured microhardness was compared with an analysis which is based on dislocation pinning by carbon; a good correlation was observed. The Labusch model for the effect of pinning sites on dislocation motion is given.

  2. Effects of Germanium on Movement of Dislocations in p-Type Czochralski Silicon

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    By indentation at room temperature followed by annealing at high temperatures, the pinning effect of germanium on dislocations in germanium-doped Czochralski silicon was investigated. Experimental results show that the dislocations in germanium-doped Czochralski silicon move shorter and slower than those in Czochralski silicon undoping with germanium when the concentration of germanium is over 1×1018 cm-3. The retarding velocity of dislocations is contributed to the dislocations pinning effect of the strain field introduced by the high concentration germanium, and the Ge4B cluster and the oxygen precipitation those are preferred to form at higher concentration germanium.

  3. Low-temperature TCT characterization of heavily proton irradiated p-type magnetic Czochralski silicon detectors

    CERN Document Server

    Härkönen, J; Luukka, P; Kassamakov, I; Autioniemi, M; Tuominen, E; Sane, P; Pusa, P; Räisänen, J; Eremin, V; Verbitskaya, E; Li, Z

    2007-01-01

    n+/p−/p+ pad detectors processed at the Microelectronics Center of Helsinki University of Technology on boron-doped p-type high-resistivity magnetic Czochralski (MCz-Si) silicon substrates have been investigated by the transient current technique (TCT) measurements between 100 and 240 K. The detectors were irradiated by 9 MeV protons at the Accelerator Laboratory of University of Helsinki up to 1 MeV neutron equivalent fluence of 2×1015 n/cm2. In some of the detectors the thermal donors (TD) were introduced by intentional heat treatment at 430 °C. Hole trapping time constants and full depletion voltage values were extracted from the TCT data. We observed that hole trapping times in the order of 10 ns were found in heavily (above 1×1015 neq/cm2) irradiated samples. These detectors could be fully depleted below 500 V in the temperature range of 140–180 K.

  4. Porous silicon damage enhanced phosphorus and aluminium gettering of p-type Czochralski silicon

    Energy Technology Data Exchange (ETDEWEB)

    Hassen, M. [Institut National de Recherche Scientifique et Technique, Laboratoire de Photovoltaique et des Semiconducteurs, PB 95 2050 Hammam-Lif (Tunisia); Ben Jaballah, A. [Institut National de Recherche Scientifique et Technique, Laboratoire de Photovoltaique et des Semiconducteurs, PB 95 2050 Hammam-Lif (Tunisia)]. E-mail: gadour2003@yahoo.fr; Hajji, M. [Institut National de Recherche Scientifique et Technique, Laboratoire de Photovoltaique et des Semiconducteurs, PB 95 2050 Hammam-Lif (Tunisia); Rahmouni, H. [Laboratoire de Physique des Semiconducteurs et des Composants Electroniques, Faculte des Sciences de Monastir, Rue de Kairouan, 5000 Monastir (Tunisia); Selmi, A. [Laboratoire de Physique des Semiconducteurs et des Composants Electroniques, Faculte des Sciences de Monastir, Rue de Kairouan, 5000 Monastir (Tunisia); Ezzaouia, H. [Institut National de Recherche Scientifique et Technique, Laboratoire de Photovoltaique et des Semiconducteurs, PB 95 2050 Hammam-Lif (Tunisia)

    2005-12-05

    In this work, porous silicon damage (PSD) is presented as a simple sequence for efficient external purification techniques. The method consists of using thin nanoporous p-type silicon on both sides of the silicon substrates with randomly hemispherical voids. Then, two main sample types are processed. In the first type, thin aluminium layers ({>=}1 {mu}m) are thermally evaporated followed by photo-thermal annealing treatments in N{sub 2} atmosphere at one of several temperatures ranging between 600 and 800 deg. C. In the second type, phosphorus is continually diffused in N{sub 2}/O{sub 2} ambient in a solid phase from POCl{sub 3} solution during heating at one of several temperatures ranging between 750 and 1000 deg. C for 1 h. Hall Effect and Van Der Pauw methods prove the existence of an optimum temperature in the case of phosphorus gettering at 900 deg. C yielding a Hall mobility of about 982 cm{sup 2} V{sup -1} s{sup -1}. However, in the case of aluminium gettering, there is no gettering limit in the as mentioned temperature range. Metal/Si Schottky diodes are elaborated to clarify these improvements. In this study, we demonstrate that enhanced metal solubility model cannot explain the gettering effect. The solid solubility of aluminium is higher than that of P atoms in silicon; however, the device yield confirms the effectiveness of phosphorus as compared to aluminium.

  5. Characterization of micro-strip detectors made with high resistivity n- and p-type Czochralski silicon

    Energy Technology Data Exchange (ETDEWEB)

    Macchiolo, A. [INFN and Universita degli Studi di Florence (Italy)]. E-mail: Anna.Macchiolo@fi.infn.it; Borrello, L. [INFN and Universita degli Studi di Pisa (Italy); Boscardin, M. [ITC-IRST Trento, Povo, Trento (Italy); Bruzzi, M. [INFN and Universita degli Studi di Florence (Italy); Creanza, D. [INFN and Dipartimento Interateneo di Fisica, Bari (Italy); Dalla Betta, G.-F. [ITC-IRST Trento, Povo, Trento (Italy); DePalma, M. [INFN and Dipartimento Interateneo di Fisica, Bari (Italy); Focardi, E. [INFN and Universita degli Studi di Florence (Italy); Manna, N. [INFN and Dipartimento Interateneo di Fisica, Bari (Italy); Menichelli, D. [INFN and Universita degli Studi di Florence (Italy); Messineo, A. [INFN and Universita degli Studi di Pisa (Italy); Piemonte, C. [ITC-IRST Trento, Povo, Trento (Italy); Radicci, V. [INFN and Dipartimento Interateneo di Fisica, Bari (Italy); Ronchin, S. [ITC-IRST Trento, Povo, Trento (Italy); Scaringella, M. [INFN and Universita degli Studi di Florence (Italy); Segneri, G. [INFN and Universita degli Studi di Pisa (Italy); Sentenac, D. [INFN and Universita degli Studi di Pisa (Italy); Zorzi, N. [ITC-IRST Trento, Povo, Trento (Italy)

    2007-04-01

    The results of the pre- and post-irradiation characterization of n- and p-type magnetic Czochralski silicon micro-strip sensors are reported. This work has been carried out within the INFN funded SMART project aimed at the development of radiation-hard semiconductor detectors for the luminosity upgrade of the large Hadron collider (LHC). The detectors have been fabricated at ITC-IRST (Trento, Italy) on 4 in wafers and the layout contains 10 mini-sensors. The devices have been irradiated with 24 GeV/c and 26 MeV protons in two different irradiation campaigns up to an equivalent fluence of 3.4x10{sup 15} 1-MeV n/cm{sup 2}. The post-irradiation results show an improved radiation hardness of the magnetic Czochralski mini-sensors with respect to the reference float-zone sample.

  6. Precipitation of Cu and Ni in n- and p-type Czochralski-grown silicon characterized by photoluminescence imaging

    Science.gov (United States)

    Sun, Chang; Nguyen, Hieu T.; Rougieux, Fiacre E.; Macdonald, Daniel

    2017-02-01

    Photoluminescence (PL) images and micro-PL maps were taken on Cu- or Ni-doped monocrystalline silicon wafers, to investigate the distribution of the metal precipitates. Several n-type and p-type wafers were used in which Cu or Ni were introduced in the starting melt of the ingots and precipitated during the ingot cooling (as opposed to surface contamination). The micro-PL mapping allowed investigation of the metal precipitates with a higher spatial resolution. Markedly different precipitation patterns were observed in n- and p-type samples: in both Cu- and Ni-doped n-type samples, circular central regions and edge regions were observed. In these regions, particles were distributed randomly and homogeneously. In the p-type Cu-doped and Ni-doped samples, by contrast, the precipitates occurred in lines along orientations. The difference in the precipitation behaviour in n- and p-type samples is conjectured to be caused by different concentrations of self-interstitials and vacancies remaining in the crystal during the ingot cooling: there are more vacancies in the n-type ingots but more interstitials in the p-type ingots. The dopant effects on the intrinsic point defect concentrations in silicon crystals and possible precipitation mechanisms are discussed based on the findings in this work and the literature.

  7. A novel method to enhance the gettering efficiency in p-type Czochralski silicon by a sacrificial porous silicon layer

    Institute of Scientific and Technical Information of China (English)

    Zhang Caizhen; Wang Yongshun; Wang Zaixing

    2011-01-01

    A new two-step phosphorous diffusion gettering (TSPDG) process using a sacrificial porous silicon layer (PSL) is proposed.Due to a decrease in high temperature time,the TSPDG (PSL) process weakens the deterioration in performances of PSL,and increases the capability of impurity clusters to dissolve and diffuse to the gettering regions.By means of the TSPDG (PSL) process under conditions of 900 ℃/60 min + 700 ℃/30 min,the effective lifetime of minority carriers in solar-grade (SOG) Si is increased to 14.3 times its original value,and the short-circuit current density of solar cells is improved from 23.5 o 28.7 mA/cm2,and the open-circuit voltage from 0.534 to 0.596 V along with the transform efficiency from 8.1% to 11.8%,which are much superior to the results achieved by the PDG (PSL) process at 900 ℃ for 90 min.

  8. Effect of Rapid Thermal Processing on Light-Induced Degradation of Carrier Lifetime in Czochralski p-Type Silicon Bare Wafers

    Science.gov (United States)

    Kouhlane, Y.; Bouhafs, D.; Khelifati, N.; Belhousse, S.; Menari, H.; Guenda, A.; Khelfane, A.

    2016-11-01

    The electrical properties of Czochralski silicon (Cz-Si) p-type boron-doped bare wafers have been investigated after rapid thermal processing (RTP) with different peak temperatures. Treated wafers were exposed to light for various illumination times, and the effective carrier lifetime ( τ eff) measured using the quasi-steady-state photoconductance (QSSPC) technique. τ eff values dropped after prolonged illumination exposure due to light-induced degradation (LID) related to electrical activation of boron-oxygen (BO) complexes, except in the sample treated with peak temperature of 785°C, for which the τ eff degradation was less pronounced. Also, a reduction was observed when using the 830°C peak temperature, an effect that was enhanced by alteration of the wafer morphology (roughness). Furthermore, the electrical resistivity presented good stability under light exposure as a function of temperature compared with reference wafers. Additionally, the optical absorption edge shifted to higher wavelength, leading to increased free-carrier absorption by treated wafers. Moreover, a theoretical model is used to understand the lifetime degradation and regeneration behavior as a function of illumination time. We conclude that RTP plays an important role in carrier lifetime regeneration for Cz-Si wafers via modification of optoelectronic and structural properties. The balance between an optimized RTP cycle and the rest of the solar cell elaboration process can overcome the negative effect of LID and contribute to achievement of higher solar cell efficiency and module performance.

  9. Magnetic Czochralski silicon as detector material

    CERN Document Server

    Härkönen, J; Luukka, P; Nordlund, H K; Tuominen, E

    2007-01-01

    The Czochralski silicon (Cz-Si) has intrinsically high oxygen concentration. Therefore Cz-Si is considered as a promising material for the tracking systems in future very high luminosity colliders. In this contribution a brief overview of the Czochralski crystal growth is given. The fabrication process issues of Cz-Si are discussed and the formation of thermal donors is especially emphasized. N+/p−/p+ and p+/n−/n+ detectors have been processed on magnetic Czochralski (MCz-Si) wafers. We show measurement data of AC-coupled strip detectors and single pad detectors as well as experimental results of intentional TD doping. Data of spatial homogeneity of electrical properties, full depletion voltage and leakage current, is shown and n and p-type devices are compared. Our results show that it is possible to manufacture high quality n+/p−/p+ and p+/n−/n+ particle detectors from high-resistivity Cz-Si.

  10. DLTS of p-type Czochralski Si wafers containing processing-induced macropores

    Science.gov (United States)

    Simoen, E.; Depauw, V.; Gordon, I.; Poortmans, J.

    2012-01-01

    The deep levels present in p-type Czochralski silicon with processing-induced macropores in the depletion region have been studied by the deep-level transient (DLT) spectroscopy technique. It is shown that a broad band is present for a bias pulse close to the interface with the Al Schottky contact, which exhibits anomalously slow hole capture and is ascribed to the internal interface states of the macropores. For depths beyond the pore region, other deep levels, associated with point defects—possibly metal contamination during the high-temperature annealing step under H2 ambient--have been observed. The impact of the observed defects on the lifetime of thin-film solar cells, fabricated using macropore-based layer transfer is discussed. Finally, it is shown that the presence of pores in the depletion region, which also affects the DLT-spectrum, alters the capacitance-voltage characteristics.

  11. Particle detectors made of high-resistivity Czochralski silicon

    CERN Document Server

    Härkönen, J; Ivanov, A; Li, Z; Luukka, Panja; Pirojenko, A; Riihimaki, I; Tuominen, E; Tuovinen, E; Verbitskaya, E; Virtanen, A

    2005-01-01

    We have processed pin-diodes and strip detectors on n- and p-type high-resistivity silicon wafers grown by magnetic Czochralski method. The Czochralski silicon (Cz-Si) wafers manufactured by Okmetic Oyj have nominal resistivity of 900 Omega cm and 1.9 kOmega cm for n- and p-type, respectively. The oxygen concentration in these substrates is slightly less than typically in wafers used for integrated circuit fabrication. This is optimal for semiconductor fabrication as well as for radiation hardness. The radiation hardness of devices has been investigated with several irradiation campaigns including low- and high-energy protons, neutrons, gamma-rays, lithium ions and electrons. Cz-Si was found to be more radiation hard than standard Float Zone silicon (Fz-Si) or oxygenated Fz-Si. When irradiated with protons, the full depletion voltage in Cz-Si has not exceeded its initial value of 300 V even after the fluence of 5 multiplied by 10**1**4 cm**-**2 1-MeV eq. n cm **-**2 that equals more than 30 years operation of...

  12. Piezoresistance in p-type silicon revisited

    DEFF Research Database (Denmark)

    Richter, Jacob; Pedersen, Jesper; Brandbyge, Mads;

    2008-01-01

    We calculate the shear piezocoefficient pi44 in p-type Si with a 6×6 k·p Hamiltonian model using the Boltzmann transport equation in the relaxation-time approximation. Furthermore, we fabricate and characterize p-type silicon piezoresistors embedded in a (001) silicon substrate. We find that the ...

  13. Growth of Czochralski silicon under magnetic field

    Institute of Scientific and Technical Information of China (English)

    XU Yuesheng; LIU Caichi; WANG Haiyun; ZHANG Weilian; YANG Qingxin; LI Yangxian; REN Binyan; LIU Fugui

    2004-01-01

    Growth of Czochralski (CZ) silicon crystals under the magnetic field induced by a cusp-shaped permanent magnet of NdFeB has been investigated. It is found that the mass transport in silicon melt was controlled by its diffusion while the magnetic intensity at the edge of a crucible was over 0.15 T. In comparison with the growth of conventional CZ silicon without magnetic field, the resistivity homogeneity of the CZ silicon under the magnetic field was improved. Furthermore, the Marangoni convection which has a significant influence on the control of oxygen concentration was observed on the surface of silicon melt. It is suggested that the crystal growth mechanism in magnetic field was similar to that in micro-gravity if a critical value was reached, named the growth of equivalent micro-gravity. The relationship of the equivalent micro-gravity and the magnetic intensity was derived as g=(v0/veff)g0. Finally, the orders of the equivalent micro-gravity corresponding to two crucibles with characteristic sizes were calculated.

  14. Test beam results of a large area strip detector made on high resistivity Czochralski silicon

    CERN Document Server

    Tuominen, E; Czellar, S; Härkönen, J; Heikkinen, A M; Johansson, P; Karimäki, V; Luukka, Panja; Mehtälä, P; Niku, J; Nummela, S; Nysten, J; Simpura, J; Tuominiemi, J; Tuovinen, E; Ungaro, D; Vaarala, T; Voutilainen, M; Wendland, L; Zibellini, A

    2003-01-01

    We have tested the detection performance of a strip detector processed on silicon wafer grown by magnetic Czochralski (MCZ) method. This is the first time a full size Czochralski detector has been tested in a beam, although the advantages of CZ silicon have been known before. Prior to test beam measurements, the electrical characteristics of the Czochralski silicon detectors were found to be appropriate for particle detection. Using the Helsinki silicon beam telescope at CERN H2 test beam, the performance of the Czochralski silicon detector was shown to be comparable with the existing silicon strip detectors.

  15. Test beam results of a large area strip detector made on high resistivity Czochralski silicon

    Energy Technology Data Exchange (ETDEWEB)

    Tuominen, E.; Banzuzi, K.; Czellar, S.; Heikkinen, A.; Haerkoenen, J.; Johansson, P.; Karimaeki, V.; Luukka, P.; Mehtaelae, P.; Niku, J.; Nummela, S.; Nysten, J.; Simpura, J.; Tuovinen, E.; Tuominiemi, J.; Ungaro, D.; Vaarala, T.; Wendland, L.; Voutilainen, M.; Zibellini, A

    2003-09-01

    We have tested the detection performance of a strip detector processed on silicon wafer grown by magnetic Czochralski (MCZ) method. This is the first time a full size Czochralski detector has been tested in a beam, although the advantages of CZ silicon have been known before. Prior to test beam measurements, the electrical characteristics of the Czochralski silicon detectors were found to be appropriate for particle detection. Using the Helsinki Silicon Beam telescope at CERN H2 test beam, the performance of the Czochralski silicon detector was shown to be comparable with the existing silicon strip detectors.

  16. The intrinsic gettering in neutron irradiation Czochralski-silicon

    CERN Document Server

    Li Yang Xian; Niu Ping Juan; Liu Cai Chi; Xu Yue Sheng; Yang Deren; Que Duan Lin

    2002-01-01

    The intrinsic gettering in neutron irradiated Czochralski-silicon is studied. The result shows that a denuded zone at the surface of the neutron irradiated Czochralski-silicon wafer may be formed through one-step short-time annealing. The width of the denuded zone is dependent on the annealing temperature and the dose of neutron irradiation, while it is irrelated to the annealing time in case the denuded zone is formed. The authors conclude that the interaction between the defects induced by neutron irradiation and the oxygen in the silicon accelerates the oxygen precipitation in the bulk, and becomes the dominating factor of the quick formation of intrinsic gettering. It makes the effect of thermal history as the secondary factor

  17. Comparing n- and p-type polycrystalline silicon absorbers in thin-film solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Deckers, J. [imec, Kapeldreef 75, B-3001 Heverlee, Leuven (Belgium); ESAT, KU Leuven, Kardinaal Mercierlaan 94, B-3001 Heverlee, Leuven (Belgium); Bourgeois, E. [Institute for Materials Research (IMO), Hasselt University, Wetenschapspark 1, B-3590 Diepenbeek (Belgium); IMOMEC, IMEC vzw, Wetenschapspark 1, B-3590 Diepenbeek (Belgium); Jivanescu, M. [Department of Physics and Astronomy, University of Leuven, Celestijnenlaan 200D, B-3001 Heverlee, Leuven (Belgium); Abass, A. [Photonics Research Group (INTEC), Ghent University-imec, Sint-Pietersnieuwstraat 41, B-9000 Ghent (Belgium); Van Gestel, D.; Van Nieuwenhuysen, K.; Douhard, B. [imec, Kapeldreef 75, B-3001 Heverlee, Leuven (Belgium); D' Haen, J.; Nesladek, M.; Manca, J. [Institute for Materials Research (IMO), Hasselt University, Wetenschapspark 1, B-3590 Diepenbeek (Belgium); IMOMEC, IMEC vzw, Wetenschapspark 1, B-3590 Diepenbeek (Belgium); Gordon, I.; Bender, H. [imec, Kapeldreef 75, B-3001 Heverlee, Leuven (Belgium); Stesmans, A. [Department of Physics and Astronomy, University of Leuven, Celestijnenlaan 200D, B-3001 Heverlee, Leuven (Belgium); Mertens, R.; Poortmans, J. [imec, Kapeldreef 75, B-3001 Heverlee, Leuven (Belgium); ESAT, KU Leuven, Kardinaal Mercierlaan 94, B-3001 Heverlee, Leuven (Belgium)

    2015-03-31

    We have investigated fine grained polycrystalline silicon thin films grown by direct chemical vapor deposition on oxidized silicon substrates. More specifically, we analyze the influence of the doping type on the properties of this model polycrystalline silicon material. This includes an investigation of defect passivation and benchmarking of minority carrier properties. In our investigation, we use a variety of characterization techniques to probe the properties of the investigated polycrystalline silicon thin films, including Fourier Transform Photoelectron Spectroscopy, Electron Spin Resonance, Conductivity Activation, and Suns-Voc measurements. Amphoteric silicon dangling bond defects are identified as the most prominent defect type present in these layers. They are the primary recombination center in the relatively lowly doped polysilicon thin films at the heart of the current investigation. In contrast with the case of solar cells based on Czochralski silicon or multicrystalline silicon wafers, we conclude that no benefit is found to be associated with the use of n-type dopants over p-type dopants in the active absorber of the investigated polycrystalline silicon thin-film solar cells. - Highlights: • Comparison of n- and p-type absorbers for thin-film poly-Si solar cells • Extensive characterization of the investigated layers' characteristics • Literature review pertaining the use of n-type and p-type dopants in silicon.

  18. Growth and characterization of Czochralski-grown n and p-type GaAs for space solar cell substrates

    Science.gov (United States)

    Chen, R. T.

    1983-01-01

    Progress in LEC (liquid encapsulated Czochralski) crystal growth techniques for producing high-quality, 3-inch-diameter, n- and p-type GaAs crystals suitable for solar cell applications is described. The LEC crystals with low dislocation densities and background impurities, high electrical mobilities, good dopant uniformity, and long diffusion lengths were reproducibly grown through control of the material synthesis, growth and doping conditions. The capability for producing these large-area, high-quality substrates should positively impact the manufacturability of highly efficiency, low cost, radiation-hard GaAs solar cells.

  19. CCE measurements and annealing studies on proton-irradiated p-type MCz silicon diodes

    CERN Document Server

    Hoedlmoser, H; Köhler, M; Nordlund, H

    2007-01-01

    Magnetic Czochralski (MCz) silicon has recently been investigated for the development of radiation tolerant detectors for future high-luminosity HEP experiments. A study of p-type MCz Silicon diodes irradiated with protons up to a fluence of has been performed by means of Charge Collection Efficiency (CCE) measurements as well as standard CV/IV characterizations. The changes of CCE, full depletion voltage and leakage current as a function of fluence are reported. A subsequent annealing study of the irradiated detectors shows an increase in effective doping concentration and a decrease in the leakage current, whereas the CCE remains basically unchanged. Two different series of detectors have been compared differing in the implantation dose of p-spray isolation as well as effective doping concentration (Neff) of the p-type bulk presumably due to a difference in thermal donor (TD) activation during processing. The series with the higher concentration of TDs shows a delayed reverse annealing of Neff after irradia...

  20. Photoluminescence of Dislocations in Nitrogen Doped Czochralski Silicon

    Institute of Scientific and Technical Information of China (English)

    LI Dong-Sheng; YANG De-Ren; E.Leoni; S.Binetti; S.Pizzini

    2004-01-01

    @@ We investigate optical properties of dislocations in nitrogen-doped and nitrogen-free Czochralski silicon. The dislocations are formed during crystal growth, but not formed during deformation. The results show that in nitrogen-doped samples, a broad band replaced the D1 band of dislocation, regardless of dislocation density. The replacement ofD1 band is caused by the non-irradiation combination induced by oxygen precipitation. Moreover,a new emission at 0.975 eV is observed in both the nitrogen-free and doped samples when the dislocation density is lower than 104 cm-2.

  1. Accelerated oxygen precipitation in fast neutron irradiated Czochralski silicon

    Institute of Scientific and Technical Information of China (English)

    Ma Qiao-Yun; Li Yang-Xian; Chen Gui-Feng; Yang Shuai; Liu Li-Li; Niu Ping-Juan; Chen Dong-Feng; Li Hong-Tao

    2005-01-01

    Annealing effect of the oxygen precipitation and the induced defects have been investigated on the fast neutron irradiated Czochralski silicon (CZ-Si) by infrared absorption spectrum and the optical microscopy. It is found that the fast neutron irradiation greatly accelerates the oxygen precipitation that leads to a sharp decrease of the interstitial oxygen with the annealing time. At room temperature (RT), the 1107cm-1 infrared absorption band of interstitial oxygen becomes weak and broadens to low energy side. At low temperature, the infrared absorption peaks appear at 1078cm-1, 1096cm-1, and 1182cm-1, related to different shapes of the oxygen precipitates. The bulk microdefects,including stacking faults, dislocations and dislocation loops, were observed by the optical microscopy. New or large stacking faults grow up when the silicon self-interstitial atoms are created and aggregate with oxygen precipitation.

  2. Processing of Radiation Hard Particle Detectors on Czochralski Silicon

    CERN Document Server

    Tuovinen, Esa

    2012-01-01

    The purpose of this work was to study the radiation hardness of particle detectors. Silicon detectors are cost-effective andhave an excellent spatial resolution. Therefore, they are widely used in many high-energy physics experiments. It is knownthat oxygen improves the radiation hardness of silicon detectors. The natural way to have a high concentration of oxygen insilicon is to use magnetic Czochralski silicon (MCz-Si). MCz-Si has intrinsically a relatively uniform and high level ofoxygen (5x10^17 cm^3) compared to regular float-zone silicon (FZ-Si). Such a level is hard to attain with other methods,namely the diffusion oxygenation of float-zone silicon.In the Large Hadron Collider (LHC) and its potential upgrade, the luminosity and the fluencies of fast hadrons can be sohigh that detectors made of standard detector-grade FZ-Si might not survive the planned operating period. MCz-Si offers animprovement to the lifetime of particle detectors through improved radiation hardness.This thesis takes a process-orie...

  3. Light-induced degradation in compensated p- and n-type Czochralski silicon wafers

    Science.gov (United States)

    Geilker, Juliane; Kwapil, Wolfram; Rein, Stefan

    2011-03-01

    Light-induced degradation (LID) due to boron-oxygen complex formation seriously diminishes the minority carrier lifetime of p-type Czochralski-grown (Cz) wafers. Depending linearly on the boron concentration NA in uncompensated silicon, the boron-oxygen defect density was suggested to depend on the net doping concentration p0 = NA - ND in compensated p-type samples, containing similar amounts of boron and phosphorus [D. Macdonald, F. Rougieux, A. Cuevas, et al., Journal of Applied Physics 105, 093704 (2009)]. However, this dependency contradicts observations of LID in compensated n-type silicon wafers [T. Schutz-Kuchly, J. Veirman, S. Dubois, et al., Applied Physics Letters 96, 1 (2010)], which are confirmed in this study by investigating the boron-oxygen complex formation on a large variety of compensated p- and n-type samples. In spite of their high boron content, compensated n-type samples may show a less pronounced LID than p-type samples containing less boron. Our experiments indicate that in compensated silicon, the defect concentration is only a function of the compensation ratio RC = (NA + ND)/(NA - ND).

  4. Annealing behaviors of vacancy in varied neutron irradiated Czochralski silicon

    Institute of Scientific and Technical Information of China (English)

    CHEN Gui-feng; LI Yang-xian; LIU Li-li; NIU Ping-juan; NIU Sheng-li; CHEN Dong-feng

    2006-01-01

    The difference of annealing behaviors of vacancy-oxygen complex (VO) in varied dose neutron irradiated Czochralski silicon: (S1 5×1017 n/cm3 and S2 1.07×1019 n/cm3) were studied. The results show that the VO is one of the main defects formed in neutron irradiated Czochralski silicon (CZ-Si). In this defect,oxygen atom shares a vacancy,it is bonded to two silicon neighbors. Annealed at 200 ℃,divacancies are trapped by interstitial oxygen(Oi) to form V2O (840 cm-1). With the decrease of the 829 cm-1 (VO) three infrared absorption bands at 825 cm-1 (V2O2),834 cm-1 (V2O3) and 840 cm-1 (V2O) will rise after annealed at temperature range of 200-500 ℃. After annealed at 450-500 ℃ the main absorption bands in S1 sample are 834 cm-1,825 cm-1 and 889 cm-1 (VO2),in S2 is 825 cm-1. Annealing of A-center in varied neutron irradiated CZ-Si is suggested to consist of two processes. The first is due to trapping of VO by Oi in low dose neutron irradiated CZ-Si (S1) and the second is due to capture the wandering vacancy by VO,etc,in high dose neutron irradiated CZ-Si (S2),the VO2 plays an important role in the annealing of A-center. With the increase of the irradiation dose,the annealing behavior of A-center is changed.

  5. Annealing Studies of magnetic Czochralski silicon radiation detectors

    CERN Document Server

    Pellegrini, G; Fleta, C; Lozano, M; Rafí, J M; Ullán, M

    2005-01-01

    Silicon wafers grown by the Magnetic Czochralski (MCZ) method have been processed in form of pad diodes at Instituto de Microelectrónica de Barcelona (IMB-CNM) facilities. The n-type MCZ wafers were manufactured by Okmetic and they have a nominal resistivity of 1 kΩ cm. Diodes were characterized by reverse current and capacitance measurements before and after irradiations. The MCZ diodes were irradiated in a 24 GeV proton beam at CERN PS facilities and their annealing behavior with time was compared to that shown by oxygenated FZ diodes processed in the same way. FZ and MCZ diodes were irradiated up to fluences of 1016 p/cm2 which corresponds to the maximum fluence foreseen in the inner part of the future ATLAS upgrade in view of a Super-LHC with an increase in the luminosity.

  6. Behavior of volatile dopants (P, Sb) in Czochralski silicon growth

    Science.gov (United States)

    Porrini, M.; Scala, R.; Voronkov, V. V.

    2017-02-01

    The evaporation from the silicon melt, during Czochralski process, is an important effect for Phosphorus and Antimony dopants. The evaporation rate γ was deduced from the measured axial profile of the resistivity converted into the concentration. For the heavily doped crystals, the value of γ is very similar for both P and Sb: in the order of 5.5×10-5 cm/s (which is significantly lower than the previously reported evaporation rates). It was concluded that the rate-limiting step for the evaporation process is neither the evaporation reaction itself nor the impurity transport through the flowing gas, but rather the transport through the melt that strongly depends on the melt convection. For low Phosphorus concentration, the transport through the gas is severely slowed-down - due to a change in the dominant gaseous species, from P2 to P1 - and becomes a limiting step. The evaporation rate is decreased and, in fact, becomes negligible.

  7. p-Type Quasi-Mono Silicon Solar Cell Fabricated by Ion Implantation

    Directory of Open Access Journals (Sweden)

    Chien-Ming Lee

    2013-01-01

    Full Text Available The p-type quasi-mono wafer is a novel type of silicon material that is processed using a seed directional solidification technique. This material is a promising alternative to traditional high-cost Czochralski (CZ and float-zone (FZ material. Here, we evaluate the application of an advanced solar cell process featuring a novel method of ion implantation on p-type quasi-mono silicon wafer. The ion implantation process has simplified the normal industrial process flow by eliminating two process steps: the removal of phosphosilicate glass (PSG and the junction isolation process that is required after the conventional thermal POCl3 diffusion process. Moreover, the good passivation performance of the ion implantation process improves Voc. Our results show that, after metallization and cofiring, an average cell efficiency of 18.55% can be achieved using 156 × 156 mm p-type quasi-mono silicon wafer. Furthermore, the absolute cell efficiency obtained using this method is 0.47% higher than that for the traditional POCl3 diffusion process.

  8. Development of Radiation Hard Radiation Detectors, Differences between Czochralski Silicon and Float Zone Silicon

    CERN Document Server

    Tuominen, Eija

    2012-01-01

    The purpose of this work was to develop radiation hard silicon detectors. Radiation detectors made ofsilicon are cost effective and have excellent position resolution. Therefore, they are widely used fortrack finding and particle analysis in large high-energy physics experiments. Silicon detectors willalso be used in the CMS (Compact Muon Solenoid) experiment that is being built at the LHC (LargeHadron Collider) accelerator at CERN (European Organisation for Nuclear Research). This work wasdone in the CMS programme of Helsinki Institute of Physics (HIP).Exposure of the silicon material to particle radiation causes irreversible defects that deteriorate theperformance of the silicon detectors. In HIP CMS Programme, our approach was to improve theradiation hardness of the silicon material with increased oxygen concentration in silicon material. Westudied two different methods: diffusion oxygenation of Float Zone silicon and use of high resistivityCzochralski silicon.We processed, characterised, tested in a parti...

  9. Defects in Fast-Neutron Irradiated Nitrogen-Doped Czochralski Silicon after Annealing at High Temperature

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    Fast-neutron irradiated nitrogen-doped Czochralski silicon (NCZ-Si) was annealed at 1100 ℃ for different time, then FTIR and optical microscope were used to study the behavior of oxygen. It is found that [Oi] increase at the early stage then decrease along with the increasing of anneal time. High density induced-defects can be found in the cleavage plane. By comparing NCZ-Si with Czochralski silicon (CZ-Si), [Oi] in NCZ-Si decrease more after anneal 24 h.

  10. Study on release rate of latent heat in Czochralski silicon growth

    Institute of Scientific and Technical Information of China (English)

    REN Bingyan; YANG Jiankun; LI Yanlin; LIU Xiaoping; WANG Minhua

    2006-01-01

    The pulling rate in czochralski silicon (CZSi) growth is important for reducing the cost of solar cell.In this paper, double-heater, heat shield and composite argon duct system were introduced in the Ф450 mm hot zone of a Czochralski furnace.The pulling rate under different thermal system was recorded in experiments.Argon flow and temperature fields were simulated by finite element method(FEM).Experimental results and numerical simulation indicate that double-heater and composite argon duct system can enhance obviously the release rate of latent heat.In Φ 200 mm Czochralski silicon (CZSi) growth, average pulling rate can increase from 0.6 mm·min-1 in the conventional hot zone to 0.8 mm·min-1 in the modified hot zone.

  11. Evidence for an iron-hydrogen complex in p-type silicon

    Science.gov (United States)

    Leonard, S.; Markevich, V. P.; Peaker, A. R.; Hamilton, B.; Murphy, J. D.

    2015-07-01

    Interactions of hydrogen with iron have been studied in Fe contaminated p-type Czochralski silicon using capacitance-voltage profiling and deep level transient spectroscopy (DLTS). Hydrogen has been introduced into the samples from a silicon nitride layer grown by plasma enhanced chemical vapor deposition. After annealing of the Schottky diodes on Si:Fe + H samples under reverse bias in the temperature range of 90-120 °C, a trap has been observed in the DLTS spectra which we have assigned to a Fe-H complex. The trap is only observed when a high concentration of hydrogen is present in the near surface region. The trap concentration is higher in samples with a higher concentration of single interstitial Fe atoms. The defect has a deep donor level at Ev + 0.31 eV. Direct measurements of capture cross section of holes have shown that the capture cross section is not temperature dependent and its value is 5.2 × 10-17 cm2. It is found from an isochronal annealing study that the Fe-H complex is not very stable and can be eliminated completely by annealing for 30 min at 125 °C.

  12. Processing of microstrip detectors on Czochralski grown high resistivity silicon substrates

    CERN Document Server

    Härkönen, J; Tuovinen, E; Mehtälä, P; Lassila-Perini, K M; Ovchinnikov, V; Heikkilä, P; Ylikoski, M; Palmu, L; Kallijärvi, S; Nikkila, H; Anttila, O; Niinikoski, T O; Eremin, V; Ivanov, A; Verbitskaya, E

    2003-01-01

    We have processed large-area strip sensors on silicon wafers grown by the magnetic Czochralski (MCZ) method. The n-type MCZ silicon wafers manufactured by Okmetic Oyj have nominal resistivity of 900 Omega cm and oxygen concentration of less than 10 ppma. The Photoconductive Decay (PCD) measurements, current-voltage measurements and capacitance-voltage measurements were made to characterise the samples. The leakage current of 3 muA at 900 V bias voltage was measured on the 32.5 cm**2 detector. Detector depletion took place at about 420 V. According to PCD measurements, process induced contamination was effectively bound and neutralised by the oxygen present in Czochralski silicon. During the sample processing, the silicon resistivity increased in spite of the lack of specific donor- killing heat treatment.

  13. Effects of argon gas flow rate and guide shell on oxygen concentration in Czochralski silicon growth

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    φ200 mm silicon single crystals were grown in the φ450 mm hot zone of a Czochralski (CZ) furnace. By modifying the pattern and the velocity of the argon flow, the silicon single crystals with different oxygen concentrations were obtained. Through numerical simulation, the velocity of the argon gas flow was plotted for the first time. The experiment results were analyzed and the optimum condition of the argon flow with the lowest oxygen concentration was obtained.

  14. Kinetics of Nitrogen Indiffusion in Czochralski Silicon Annealed in Nitrogen Ambient

    Institute of Scientific and Technical Information of China (English)

    LI Ming; MA Xiang-Yang; YANG De-Ren

    2008-01-01

    By means of low-temperature(10K)Fourier transform infrared absorption spectroscopy,the kinetics of nitrogen indiffusion in Czochralski(CZ)silicon annealed 8t 1150-1250°C in nitrogen ambient is investigated.Moreover,the nitrogen diffusivities in CZ silicon at elevated temperatures deduced herein are in good agreement with those previously obtained in float-zone silicon,thus leading to the conclusion that the nitrogen indiffusion in CZ silicon at elevated temperatures is via nitrogen pairs.

  15. Effective surface passivation of p-type crystalline silicon with silicon oxides formed by light-induced anodisation

    Energy Technology Data Exchange (ETDEWEB)

    Cui, Jie, E-mail: j.cui@unsw.edu.au [School of Photovoltaic and Renewable Energy Engineering, The University of New South Wales, Sydney 2052 (Australia); Grant, Nicholas [Centre for Sustainable Energy Systems, Australian National University, Canberra, A.C.T. 0200 (Australia); Lennon, Alison [School of Photovoltaic and Renewable Energy Engineering, The University of New South Wales, Sydney 2052 (Australia)

    2014-12-30

    Highlights: • The surface passivation by anodic SiO{sub 2} formed by light-induced anodisation is investigated. • The anodic SiO{sub 2} grows lower temperatures with shorter growth times. After annealing in oxygen and then forming gas the effective minority carrier lifetime is increased to 150 μs. • It shows a very low positive Q{sub eff} of 3.4 × 10{sup 11} cm{sup −2}, a moderate D{sub it} of 6 × 10{sup 11} eV{sup −1} cm{sup −2}. • It has a very low leakage current density suggesting its application in solar cell as a functional dielectric. - Abstract: Electronic surface passivation of p-type crystalline silicon by anodic silicon dioxide (SiO{sub 2}) was investigated. The anodic SiO{sub 2} was grown by light-induced anodisation (LIA) in diluted sulphuric acid at room temperature, a process that is significantly less-expensive than thermal oxidation which is widely-used in silicon solar cell fabrication. After annealing in oxygen and then forming gas at 400 °C for 30 min, the effective minority carrier lifetime of 3–5 Ω cm, boron-doped Czochralski silicon wafers with a phosphorus-doped 80 Ω/□ emitter and a LIA anodic SiO{sub 2} formed on the p-type surface was increased by two orders of magnitude to 150 μs. Capacitance–voltage measurements demonstrated a very low positive charge density of 3.4 × 10{sup 11} cm{sup −2} and a moderate density of interface states of 6 × 10{sup 11} eV{sup −1} cm{sup −2}. This corresponded to a silicon surface recombination velocity of 62 cm s{sup −1}, which is comparable with values reported for other anodic SiO{sub 2} films, which required higher temperatures and longer growth times, and significantly lower than oxides grown by chemical vapour deposition techniques. Additionally, a very low leakage current density of 3.5 × 10{sup −10} and 1.6 × 10{sup −9} A cm{sup −2} at 1 and −1 V, respectively, was measured for LIA SiO{sub 2} suggesting its potential application as insulation layer in

  16. Influence of rapid thermal process on intrinsic gettering in fast neutron irradiated Czochralski silicon

    Institute of Scientific and Technical Information of China (English)

    CHEN Gui-feng; LI Yang-xian; LI Xing-hua; CAI Li-li; MA Qiao-yun; NIU Ping-juan; NIU Sheng-li; CHEN Dong-feng

    2006-01-01

    A rapid thermal process (RTP) was first introduced into the intrinsic gettering (IG) processes of fast neutron irradiated Czochralski (CZ) silicon. The effect of RTP conditions on bulk microdefects (BMDs) and denuded zone (DZ) was investigated. Fourier transform infrared absorption spectrometer (FTIR) was used to measure the concentration of interstitial oxygen ([Oi]). Bulk microdefects were observed by optical microscope. The results show that,according to the variation of [Oi],it is found that RTP doesn't change the processes of oxygen precipitation in fast neutron irradiated Czochralski silicon. Perfect denuded zone,dense oxygen precipitates and defects form in the bulk of irradiated samples. With increasing temperature of RTP,the width of denuded zone decreases. Increasing RTP cooling rate,the density of Bulk microdefects increases. DZ forms in the sample that annealed in nitrogen atmosphere.

  17. P type porous silicon resistivity and carrier transport

    Energy Technology Data Exchange (ETDEWEB)

    Ménard, S., E-mail: samuel.menard@st.com [STMicroelectronics, 10, rue Thalès de Milet, 37071 Tours Cedex 2 (France); Fèvre, A. [STMicroelectronics, 10, rue Thalès de Milet, 37071 Tours Cedex 2 (France); Université François Rabelais de Tours, CNRS, CEA, INSA CVL, GREMAN UMR 7347, Tours (France); Billoué, J.; Gautier, G. [Université François Rabelais de Tours, CNRS, CEA, INSA CVL, GREMAN UMR 7347, Tours (France)

    2015-09-14

    The resistivity of p type porous silicon (PS) is reported on a wide range of PS physical properties. Al/PS/Si/Al structures were used and a rigorous experimental protocol was followed. The PS porosity (P{sub %}) was found to be the major contributor to the PS resistivity (ρ{sub PS}). ρ{sub PS} increases exponentially with P{sub %}. Values of ρ{sub PS} as high as 1 × 10{sup 9} Ω cm at room temperature were obtained once P{sub %} exceeds 60%. ρ{sub PS} was found to be thermally activated, in particular, when the temperature increases from 30 to 200 °C, a decrease of three decades is observed on ρ{sub PS}. Based on these results, it was also possible to deduce the carrier transport mechanisms in PS. For P{sub %} lower than 45%, the conduction occurs through band tails and deep levels in the tissue surrounding the crystallites. When P{sub %} overpasses 45%, electrons at energy levels close to the Fermi level allow a hopping conduction from crystallite to crystallite to appear. This study confirms the potential of PS as an insulating material for applications such as power electronic devices.

  18. Single crystals of bismuth silicon oxide grown by the Czochralski technique and their characterisation

    Directory of Open Access Journals (Sweden)

    ANDREJA VALCIC

    1999-09-01

    Full Text Available Single crystals of Bi12SiO20 were grown by the Czochralski technique. The critical diameter and the critical rate of rotation were calculated. Suitable polishing and etching solutions were determined. X-Ray measurements were performed on powdered samples to obtain the lattice parameters. The optical properties of the bismuth silicon oxide single crystals were investigated. The obtained results are discussed and compared with published data.

  19. Denuded Zone Formation in Germanium Codoped Heavily Phosphorus-Doped Czochralski Silicon

    Institute of Scientific and Technical Information of China (English)

    LIN Li-Xia; CHEN Jia-He; WU Peng; ZENG Yu-Heng; MA Xiang-Yang; YANG De-Ren

    2011-01-01

    The formation of a denuded zone(DZ) by conventional furnace annealing(CFA) and rapid thermal annealing (RTA) based denudation processing is investigated and the gettering of copper(Cu) atoms in germanium co-doped heavily phosphorus-doped Czochralski(GHPCZ)silicon wafers is evaluated. It is suggested that both a good quality defect-free DZ with a suitable width in the sub-surface area and a high density bulk micro-defect(BMD)region could be formed in heavily phosphorus-doped Czochralski(HPCZ)silicon and GHPCZ silicon wafers.This is ascribed to the formation of phosphorus-vacancy(P-V) related complexes and germanium-vacancy(GeV) related complexes. Compared with HPCZ silicon, the DZ width is wider in the GHPCZ silicon sample with CFA-based denudation processing but narrower in the one with two-step RTA pretreatments. These phenomena are ascribed to the enhancing effect of germanium on oxygen out-diffusion movement and oxygen precipitate nucleation, respectively. Furthermore, fairly clean DZs near the surface remain in both the HPCZ and GHPCZ silicon wafers after Cu in-diffusion, except for the HPCZ silicon wafer which underwent denudation processing with a CFA pretreatment, suggesting that germanium doping could improve the gettering of Cu contamination.

  20. Three-dimensional evaluation of gettering ability for oxygen atoms at small-angle tilt boundaries in Czochralski-grown silicon crystals

    Energy Technology Data Exchange (ETDEWEB)

    Ohno, Yutaka, E-mail: yutakaohno@imr.tohoku.ac.jp; Inoue, Kaihei; Fujiwara, Kozo; Deura, Momoko; Kutsukake, Kentaro; Yonenaga, Ichiro [Institute for Materials Research (IMR), Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-8577 (Japan); Shimizu, Yasuo; Inoue, Koji; Ebisawa, Naoki; Nagai, Yasuyoshi [The Oarai Center, IMR, Tohoku University, Oarai, Ibaraki 311-1313 (Japan)

    2015-06-22

    Three-dimensional distribution of oxygen atoms at small-angle tilt boundaries (SATBs) in Czochralski-grown p-type silicon ingots was investigated by atom probe tomography combined with transmission electron microscopy. Oxygen gettering along edge dislocations composing SATBs, post crystal growth, was observed. The gettering ability of SATBs would depend both on the dislocation strain and on the dislocation density. Oxygen atoms would agglomerate in the atomic sites under the tensile hydrostatic stress larger than about 2.0 GPa induced by the dislocations. It was suggested that the density of the atomic sites, depending on the tilt angle of SATBs, determined the gettering ability of SATBs.

  1. Maximum length of large diameter Czochralski silicon single crystals at fracture stress limit of seed

    Science.gov (United States)

    Kim, K. M.; Smetana, P.

    1990-03-01

    Growth of large diameter Czochralski (CZ) silicon crystals require complete elimination of dislocations by means of Dash technique, where the seed diameter is reduced to a small size typically 3 mm in conjunction with increase in the pull rate. The maximum length of the large CZ silicon is estimated at the fracture stress limit of the seed neck diameter ( d). The maximum lengths for 200 and 300 mm CZ crystals amount to 197 and 87 cm, respectively, with d = 0.3 cm; the estimated maximum weight is 144 kg.

  2. Impurity engineering for germanium-doped Czochralski silicon wafer used for ultra large scale integrated circuit

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Jiahe; Yang, Deren [State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou (China)

    2009-07-01

    Internal gettering (IG) technology has been challenged by both the reduction of thermal budget during device fabrication and the enlargement of wafer diameter. Improving the properties of Czochralski (Cz) silicon wafers by intentional impurity doping, the so-called 'impurity engineering (IE)', is defined. Germanium has been found to be one of the important impurities for improving the internal gettering effect in Cz silicon wafer. In this paper, the investigations on IE involved with the conventional furnace anneal based denudation processing for germanium-doped Cz silicon wafer are reviewed. Meanwhile, the potential mechanisms of germanium effects for the IE of Cz silicon wafer are also interpreted based on the experimental facts. (copyright 2009 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  3. Application of neutron transmutation doping method to initially p-type silicon material.

    Science.gov (United States)

    Kim, Myong-Seop; Kang, Ki-Doo; Park, Sang-Jun

    2009-01-01

    The neutron transmutation doping (NTD) method was applied to the initially p-type silicon in order to extend the NTD applications at HANARO. The relationship between the irradiation neutron fluence and the final resistivity of the initially p-type silicon material was investigated. The proportional constant between the neutron fluence and the resistivity was determined to be 2.3473x10(19)nOmegacm(-1). The deviation of the final resistivity from the target for almost all the irradiation results of the initially p-type silicon ingots was at a range from -5% to 2%. In addition, the burn-up effect of the boron impurities, the residual (32)P activity and the effect of the compensation characteristics for the initially p-type silicon were studied. Conclusively, the practical methodology to perform the neutron transmutation doping of the initially p-type silicon ingot was established.

  4. A DLTS study of hydrogen doped czochralski-grown silicon

    Energy Technology Data Exchange (ETDEWEB)

    Jelinek, M. [Infineon Technologies Austria AG, 9500 Villach (Austria); Laven, J.G. [Infineon Technologies AG, 81726 Munich (Germany); Kirnstoetter, S. [Institute of Solid State Physics, Graz University of Technology, 8010 Graz (Austria); Schustereder, W. [Infineon Technologies Austria AG, 9500 Villach (Austria); Schulze, H.-J. [Infineon Technologies AG, 81726 Munich (Germany); Rommel, M. [Fraunhofer Institute of Integrated Systems and Devices IISB, 91058 Erlangen (Germany); Frey, L. [Fraunhofer Institute of Integrated Systems and Devices IISB, 91058 Erlangen (Germany); Chair of Electron Devices, FAU Erlangen-Nuremberg, 91058 Erlangen (Germany)

    2015-12-15

    In this study we examine proton implanted and subsequently annealed commercially available CZ wafers with the DLTS method. Depth-resolved spreading resistance measurements are shown, indicating an additional peak in the induced doping profile, not seen in the impurity-lean FZ reference samples. The additional peak lies about 10–15 μm deeper than the main peak near the projected range of the protons. A DLTS characterization in the depth of the additional peak indicates that it is most likely not caused by classical hydrogen-related donors known also from FZ silicon but by an additional donor complex whose formation is assisted by the presence of silicon self-interstitials.

  5. A DLTS study of hydrogen doped czochralski-grown silicon

    Science.gov (United States)

    Jelinek, M.; Laven, J. G.; Kirnstoetter, S.; Schustereder, W.; Schulze, H.-J.; Rommel, M.; Frey, L.

    2015-12-01

    In this study we examine proton implanted and subsequently annealed commercially available CZ wafers with the DLTS method. Depth-resolved spreading resistance measurements are shown, indicating an additional peak in the induced doping profile, not seen in the impurity-lean FZ reference samples. The additional peak lies about 10-15 μm deeper than the main peak near the projected range of the protons. A DLTS characterization in the depth of the additional peak indicates that it is most likely not caused by classical hydrogen-related donors known also from FZ silicon but by an additional donor complex whose formation is assisted by the presence of silicon self-interstitials.

  6. Numerical analysis and simulation of Czochralski growth processes for large diameter silicon crystals

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Numerical analysis and simulation have been an effective means to develop the advanced growth technology and to control the defects type, size and density for silicon crystals of 300 mm and beyond In the present paper, numerical analysis of the melt flow in the Czochralski (CZ) crystal growth configuration, the three dimensional (3D) modeling, the simulation of melt flow under the magnetic field, the inverse modeling and the time-dependent simulation are reviewed. Finally, comparison of numerical analysis with experimental measurements is discussed.

  7. Czochralski Silicon as a Detector Material for S-LHC Tracker Volumes

    CERN Document Server

    Spiegel, Leonard; Betchart, Burt; Bhattacharya, Saptaparna; Czellar, Sandor; Demina, Regina; Dierlamm, Alexander; Frey, Martin; Gotra, Yuri; Härkönen, Jaakko; Hartmann, Frank; Kassamakov, Ivan; Korjenevski, Sergey; Kortelainen, Matti J; Lampén, Tapio; Luukka, Panja; Mäenpää, Teppo; Moilanen, Henri; Narain, Meenakshi; Neuland, Maike; Orbaker, Douglas; Simonis, Hans-Jürgen; Steck, Pia; Tuominen, Eija; Tuovinen, Esa

    2011-01-01

    With an expected ten-fold increase in luminosity in S-LHC, the radiation environment in the tracker volumes will be considerably harsher for silicon-based detectors than the already harsh LHC environment. Since 2006, a group of CMS institutes, using a modified CMS DAQ system, has been exploring the use of Magnetic Czochralski silicon as a detector element for the strip tracker layers in S-LHC experiments. Both p+/n-/n+ and n+/p-/p+ sensors have been characterized, irradiated with proton and neutron sources, assembled into modules, and tested in a CERN beamline. There have been three beam studies to date and results from these suggest that both p+/n-/n+ and n+/p-/p+ Magnetic Czochralski silicon are sufficiently radiation hard for the $R>25$ cm regions of S-LHC tracker volumes. The group has also explored the use of forward biasing for heavily irradiated detectors, and although this mode requires sensor temperatures less than -50\\,$^\\circ$C, the charge collection efficiency appears to be promising.

  8. Charge collection and capacitance-voltage analysis in irradiated n-type magnetic Czochralski silicon detectors

    Energy Technology Data Exchange (ETDEWEB)

    Petterson, M.K.; Sadrozinski, H.F.-W.; Betancourt, C. [SCIPP UC Santa Cruz, 1156 High Street, 95064 CA (United States); Bruzzi, M. [INFN, Dipartimento di Energetica, Universita di Firenze, via S. Marta 3, 50139 Florence (Italy)], E-mail: mara.bruzzi@unifi.it; Scaringella, M.; Tosi, C.; Macchiolo, A. [INFN, Dipartimento di Energetica, Universita di Firenze, via S. Marta 3, 50139 Florence (Italy); Manna, N.; Creanza, D. [Universita di Bari (Italy); Boscardin, M.; Piemonte, C.; Zorzi, N. [ITC, IRST, Povo, Trento (Italy); Borrello, L.; Messineo, A. [INFN Pisa (Italy); Dalla Betta, G.F. [Universita di Trento (Italy)

    2007-12-11

    The depletion depth of irradiated n-type silicon microstrip detectors can be inferred from both the reciprocal capacitance and from the amount of collected charge. Capacitance voltage (C-V) measurements at different frequencies and temperatures are being compared with the bias voltage dependence of the charge collection on an irradiated n-type magnetic Czochralski silicon detector. Good agreement between the reciprocal capacitance and the median collected charge is found when the frequency of the C-V measurement is selected such that it scales with the temperature dependence of the leakage current. Measuring C-V characteristics at prescribed combinations of temperature and frequency allows then a realistic estimate of the depletion characteristics of irradiated silicon strip detectors based on C-V data alone.

  9. Processing of n+/p-/p+ strip detectors with atomic layer deposition (ALD) grown Al2O3 field insulator on magnetic Czochralski silicon (MCz-si) substrates

    Science.gov (United States)

    Härkönen, J.; Tuovinen, E.; Luukka, P.; Gädda, A.; Mäenpää, T.; Tuominen, E.; Arsenovich, T.; Junkes, A.; Wu, X.; Li, Z.

    2016-08-01

    Detectors manufactured on p-type silicon material are known to have significant advantages in very harsh radiation environment over n-type detectors, traditionally used in High Energy Physics experiments for particle tracking. In p-type (n+ segmentation on p substrate) position-sensitive strip detectors, however, the fixed oxide charge in the silicon dioxide is positive and, thus, causes electron accumulation at the Si/SiO2 interface. As a result, unless appropriate interstrip isolation is applied, the n-type strips are short-circuited. Widely adopted methods to terminate surface electron accumulation are segmented p-stop or p-spray field implantations. A different approach to overcome the near-surface electron accumulation at the interface of silicon dioxide and p-type silicon is to deposit a thin film field insulator with negative oxide charge. We have processed silicon strip detectors on p-type Magnetic Czochralski silicon (MCz-Si) substrates with aluminum oxide (Al2O3) thin film insulator, grown with Atomic Layer Deposition (ALD) method. The electrical characterization by current-voltage and capacitance-voltage measurement shows reliable performance of the aluminum oxide. The final proof of concept was obtained at the test beam with 200 GeV/c muons. For the non-irradiated detector the charge collection efficiency (CCE) was nearly 100% with a signal-to-noise ratio (S/N) of about 40, whereas for the 2×1015 neq/cm2 proton irradiated detector the CCE was 35%, when the sensor was biased at 500 V. These results are comparable with the results from p-type detectors with the p-spray and p-stop interstrip isolation techniques. In addition, interestingly, when the aluminum oxide was irradiated with Co-60 gamma-rays, an accumulation of negative fixed oxide charge in the oxide was observed.

  10. Schottky Contact of Gallium on p-Type Silicon

    Directory of Open Access Journals (Sweden)

    B.P. Modi

    2011-01-01

    Full Text Available The evolution of barrier at Schottky contact and its stabilization to value characterized by the barrier height and unambiguous measurement is still being curiously perused as they hold the key control and manufacture of tailor made Schottky devices for a host of existing and potential for future applications in electronics, optoelectronics and microwave devices. In this context, gallium – silicon Schottky diode has been fabricated and analyzed.

  11. Scale up aspects of directional solidification and Czochralski silicon growth processes in traveling magnetic fields

    Science.gov (United States)

    Dropka, Natasha; Ervik, Torunn; Czupalla, Matthias; Kiessling, Frank M.

    2016-10-01

    We performed 3D simulations of directional solidification (DS) and Czochralski (Cz) silicon growth processes in traveling magnetic fields (TMFs) and verified them with the experimental data that were available. Particularly, we studied silicon DS growth in real G1, G2 and G5 size setups and Cz growth in 6″ and 24″ crucibles in furnaces provided with KRISTMAG® heater magnet modules (HMMs). TMFs were used for a solid/liquid interface shaping and for a melt stirring. Based on our simulation findings, we discussed scale up challenges and proposed a method for safe upscaling. The method related all present driving forces using dimensionless numbers: Grashof (Gr), Stephan (Ste), Reynolds (Re), Shielding (S) and magnetic forcing number (F).

  12. Flux-enhanced monochromator by ultrasound excitation of annealed Czochralski-grown silicon crystals

    CERN Document Server

    Koehler, S; Seitz, C; Magerl, A; Mashkina, E; Demin, A

    2003-01-01

    The neutron flux from monochromator crystals can be increased by ultrasound excitation or by strain fields. Rocking curves of both a perfect float-zone silicon crystal and an annealed Czochralski silicon crystal with oxygen precipitates were measured at various levels of ultrasound excitation on a cold-neutron backscattering spectrometer. We find that the effects of the dynamic strain field from the ultrasound and the static strain field from the defects are not additive. Rocking curves were also taken at different ultrasound frequencies near resonance of the crystal/ultrasound-transducer system with a time resolution of 1 min. Pronounced effects of crystal heating are observed, which render the conditions for maximum neutron reflectivity delicate. (orig.)

  13. Kinetics of self-interstitials reactions in p-type silicon irradiated with alpha particles

    Energy Technology Data Exchange (ETDEWEB)

    Makarenko, L.F., E-mail: makarenko@bsu.by [Department of Applied Mathematics and Computer Science, Belarusian State University, Independence Ave. 4, 220030 Minsk (Belarus); Moll, M. [CERN, Geneva (Switzerland); Evans-Freeman, J.H. [University of Canterbury, Christchurch (New Zealand); Lastovski, S.B.; Murin, L.I.; Korshunov, F.P. [Scientific-Practical Materials Research Centre of NAS of Belarus, Minsk (Belarus)

    2012-08-01

    New findings on the self-interstitial migration in p-type silicon are presented. They are based on experimental studies of the formation kinetics of defects related to interstitial carbon after irradiation with alpha particles. The main parameters characterizing the interaction rate of silicon self-interstitials with substitutional carbon atoms have been determined. A preliminary interpretation of the experimental data is given. The interpretation takes into account different diffusivities of self-interstitials in their singly and doubly ionized states.

  14. Test beam results of heavily irradiated magnetic Czochralski silicon (MCz-Si) strip detectors

    CERN Document Server

    Luukka, P; Korjenevski, S; Maenpaa, T; Viljanen, H; Demina, R; Gotra, Y; Lemaitre, V; Moilanen, H; Militaru, O; Bhattacharya, S; Neuland, M; Maksimow, M; Harkonen, J; Kortelainen, M J; Spiegel, L; Hartmann, F; Dierlamm, A; Tuovinen, E; Lampen, T; Simonis, H J; Betchart, B; Czellar, S; Tuominiemi, J; Keutgen, T; Frey, M; Karimaki, V

    2010-01-01

    Strip detectors with an area of 16 cm(2) were processed on high resistivity n-type magnetic Czochralski silicon. In addition, detectors were processed on high resistivity Float Zone wafers with the same mask set for comparison. The detectors were irradiated to several different fluences up to the fluence of 3 x 10(15) 1 MeV n(eq)/cm(2) with protons or with mixed protons and neutrons. The detectors were fully characterized with CV- and IV-measurements prior to and after the irradiation. The beam test was carried out at the CERN H2 beam line using a silicon beam telescope that determines the tracks of the incoming particles and hence provides a reference measurement for the detector characterization. The n-type MCz-Si strip detectors have an acceptable SIN at least up to the fluence of 1 x 10(15) n(eq)/cm(2) and thus, they are a feasible option for the strip detector layers in the SLHC tracking systems. (C) 2009 Elsevier B.V. All rights reserved.

  15. Reduction of carbon contamination during the melting process of Czochralski silicon crystal growth

    Science.gov (United States)

    Liu, Xin; Gao, Bing; Nakano, Satoshi; Kakimoto, Koichi

    2017-09-01

    Generation, incorporation, and accumulation of carbon (C) were investigated by transient global simulations of heat and mass transport during the melting process of Czochralski silicon (CZ-Si) crystal growth. Contact reaction between the quartz crucible and graphite susceptor was introduced as an extra origin of C contamination. The contribution of the contact reaction on C accumulation is affected by the back diffusion of C monoxide (CO) from the gap between the gas-guide and the crucible. The effect of the gas-guide coating on C reduction was elucidated by taking the reaction between the silicon carbide (SiC) coating and gaseous Si monoxide (SiO) into account. Application of the SiC coating on the gas-guide could effectively reduce the C contamination because of its higher thermochemical stability relative to that of graphite. Gas flow control on the back diffusion of the generated CO was examined by the parametric study of argon gas flow rate. Generation and back diffusion of CO were both effectively suppressed by the increase in the gas flow rate because of the high Péclet number of species transport. Strategies for C content reduction were discussed by analyzing the mechanisms of C accumulation process. According to the elucidated mechanisms of C accumulation, the final C content depends on the growth duration and contamination flux at the gas/melt interface.

  16. Characterization of the loss of the dislocation-free growth during Czochralski silicon pulling

    Science.gov (United States)

    Lanterne, Adeline; Gaspar, Guilherme; Hu, Yu; Øvrelid, Eivind; Di Sabatino, Marisa

    2017-01-01

    The loss of the dislocation-free growth (structure loss) during Czochralski (Cz) silicon pulling can have a strong negative impact on the production yield of the Cz photovoltaic industry. As almost no publication has been dedicated to this phenomenon in the past, this paper aims at investigate in detail the loss of the dislocation-free growth and its origin by characterizing an industrial-scale n-type Cz silicon ingot exhibiting such issue. After the occurrence of a perturbation, generation and propagation of slip dislocations in the already grown crystal have been observed. These dislocations, generated over the whole ingot cross-section, propagate with the solidification front during further growth. Additional small perturbations seem then to be responsible for their multiplication together with the transition to a multicrystalline structure. Investigations were conducted to find the perturbation causing the structure loss in the ingot. A pinhole, small gas bubble of 0.5 mm diameter, was identified as the main cause for the generation of dislocations.

  17. Reduction of Light-induced Degradation of Boron-doped Solar-grade Czochralski Silicon by Corona Charging

    OpenAIRE

    Boulfrad, Yacine; Lindroos, Jeanette; Inglese, Alessandro; Yli-Koski, Marko; Savin, Hele

    2013-01-01

    Abstract This study aims at the reduction of light-induced degradation of boron-doped solar-grade Czochralski silicon wafers by corona charging. The method consists of deposition of negative charges on both surface sides of wafer and keeping the wafer in dark for 24 hours to allow the diffusion of positively-charged interstitial copper towards the surfaces. This method proves to be useful to reduce or eliminate light-induced degradation caused by copper. The degradation was significantly redu...

  18. P-Type Silicon Strip Sensors for the new CMS Tracker at HL-LHC

    Science.gov (United States)

    Adam, W.; Bergauer, T.; Brondolin, E.; Dragicevic, M.; Friedl, M.; Frühwirth, R.; Hoch, M.; Hrubec, J.; König, A.; Steininger, H.; Waltenberger, W.; Alderweireldt, S.; Beaumont, W.; Janssen, X.; Lauwers, J.; Van Mechelen, P.; Van Remortel, N.; Van Spilbeeck, A.; Beghin, D.; Brun, H.; Clerbaux, B.; Delannoy, H.; De Lentdecker, G.; Fasanella, G.; Favart, L.; Goldouzian, R.; Grebenyuk, A.; Karapostoli, G.; Lenzi, Th.; Léonard, A.; Luetic, J.; Postiau, N.; Seva, T.; Vanlaer, P.; Vannerom, D.; Wang, Q.; Zhang, F.; Abu Zeid, S.; Blekman, F.; De Bruyn, I.; De Clercq, J.; D'Hondt, J.; Deroover, K.; Lowette, S.; Moortgat, S.; Moreels, L.; Python, Q.; Skovpen, K.; Van Mulders, P.; Van Parijs, I.; Bakhshiansohi, H.; Bondu, O.; Brochet, S.; Bruno, G.; Caudron, A.; Delaere, C.; Delcourt, M.; De Visscher, S.; Francois, B.; Giammanco, A.; Jafari, A.; Komm, M.; Krintiras, G.; Lemaitre, V.; Magitteri, A.; Mertens, A.; Michotte, D.; Musich, M.; Piotrzkowski, K.; Quertenmont, L.; Szilasi, N.; Vidal Marono, M.; Wertz, S.; Beliy, N.; Caebergs, T.; Daubie, E.; Hammad, G. H.; Härkönen, J.; Lampén, T.; Luukka, P.; Peltola, T.; Tuominen, E.; Tuovinen, E.; Eerola, P.; Tuuva, T.; Baulieu, G.; Boudoul, G.; Caponetto, L.; Combaret, C.; Contardo, D.; Dupasquier, T.; Gallbit, G.; Lumb, N.; Mirabito, L.; Perries, S.; Vander Donckt, M.; Viret, S.; Agram, J.-L.; Andrea, J.; Bloch, D.; Bonnin, C.; Brom, J.-M.; Chabert, E.; Chanon, N.; Charles, L.; Conte, E.; Fontaine, J.-Ch.; Gross, L.; Hosselet, J.; Jansova, M.; Tromson, D.; Autermann, C.; Feld, L.; Karpinski, W.; Kiesel, K. M.; Klein, K.; Lipinski, M.; Ostapchuk, A.; Pierschel, G.; Preuten, M.; Rauch, M.; Schael, S.; Schomakers, C.; Schulz, J.; Schwering, G.; Wlochal, M.; Zhukov, V.; Pistone, C.; Fluegge, G.; Kuensken, A.; Pooth, O.; Stahl, A.; Aldaya, M.; Asawatangtrakuldee, C.; Beernaert, K.; Bertsche, D.; Contreras-Campana, C.; Eckerlin, G.; Eckstein, D.; Eichhorn, T.; Gallo, E.; Garay Garcia, J.; Hansen, K.; Haranko, M.; Harb, A.; Hauk, J.; Keaveney, J.; Kalogeropoulos, A.; Kleinwort, C.; Lohmann, W.; Mankel, R.; Maser, H.; Mittag, G.; Muhl, C.; Mussgiller, A.; Pitzl, D.; Reichelt, O.; Savitskyi, M.; Schuetze, P.; Walsh, R.; Zuber, A.; Biskop, H.; Buhmann, P.; Centis-Vignali, M.; Garutti, E.; Haller, J.; Hoffmann, M.; Lapsien, T.; Matysek, M.; Perieanu, A.; Scharf, Ch.; Schleper, P.; Schmidt, A.; Schwandt, J.; Sonneveld, J.; Steinbrück, G.; Vormwald, B.; Wellhausen, J.; Abbas, M.; Amstutz, C.; Barvich, T.; Barth, Ch.; Boegelspacher, F.; De Boer, W.; Butz, E.; Caselle, M.; Colombo, F.; Dierlamm, A.; Freund, B.; Hartmann, F.; Heindl, S.; Husemann, U.; Kornmayer, A.; Kudella, S.; Muller, Th.; Simonis, H. J.; Steck, P.; Weber, M.; Weiler, Th.; Anagnostou, G.; Asenov, P.; Assiouras, P.; Daskalakis, G.; Kyriakis, A.; Loukas, D.; Paspalaki, L.; Siklér, F.; Veszprémi, V.; Bhardwaj, A.; Dalal, R.; Jain, G.; Ranjan, K.; Bakhshiansohl, H.; Behnamian, H.; Khakzad, M.; Naseri, M.; Cariola, P.; Creanza, D.; De Palma, M.; De Robertis, G.; Fiore, L.; Franco, M.; Loddo, F.; Silvestris, L.; Maggi, G.; Martiradonna, S.; My, S.; Selvaggi, G.; Albergo, S.; Cappello, G.; Chiorboli, M.; Costa, S.; Di Mattia, A.; Giordano, F.; Potenza, R.; Saizu, M. A.; Tricomi, A.; Tuve, C.; Barbagli, G.; Brianzi, M.; Ciaranfi, R.; Ciulli, V.; Civinini, C.; D'Alessandro, R.; Focardi, E.; Latino, G.; Lenzi, P.; Meschini, M.; Paoletti, S.; Russo, L.; Scarlini, E.; Sguazzoni, G.; Strom, D.; Viliani, L.; Ferro, F.; Lo Vetere, M.; Robutti, E.; Dinardo, M. E.; Fiorendi, S.; Gennai, S.; Malvezzi, S.; Manzoni, R. A.; Menasce, D.; Moroni, L.; Pedrini, D.; Azzi, P.; Bacchetta, N.; Bisello, D.; Dall'Osso, M.; Pozzobon, N.; Tosi, M.; De Canio, F.; Gaioni, L.; Manghisoni, M.; Nodari, B.; Riceputi, E.; Re, V.; Traversi, G.; Comotti, D.; Ratti, L.; Alunni Solestizi, L.; Biasini, M.; Bilei, G. M.; Cecchi, C.; Checcucci, B.; Ciangottini, D.; Fanò, L.; Gentsos, C.; Ionica, M.; Leonardi, R.; Manoni, E.; Mantovani, G.; Marconi, S.; Mariani, V.; Menichelli, M.; Modak, A.; Morozzi, A.; Moscatelli, F.; Passeri, D.; Placidi, P.; Postolache, V.; Rossi, A.; Saha, A.; Santocchia, A.; Storchi, L.; Spiga, D.; Androsov, K.; Azzurri, P.; Arezzini, S.; Bagliesi, G.; Basti, A.; Boccali, T.; Borrello, L.; Bosi, F.; Castaldi, R.; Ciampa, A.; Ciocci, M. A.; Dell'Orso, R.; Donato, S.; Fedi, G.; Giassi, A.; Grippo, M. T.; Ligabue, F.; Lomtadze, T.; Magazzu, G.; Martini, L.; Mazzoni, E.; Messineo, A.; Moggi, A.; Morsani, F.; Palla, F.; Palmonari, F.; Raffaelli, F.; Rizzi, A.; Savoy-Navarro, A.; Spagnolo, P.; Tenchini, R.; Tonelli, G.; Venturi, A.; Verdini, P. G.; Bellan, R.; Costa, M.; Covarelli, R.; Da Rocha Rolo, M.; Demaria, N.; Rivetti, A.; Dellacasa, G.; Mazza, G.; Migliore, E.; Monteil, E.; Pacher, L.; Ravera, F.; Solano, A.; Fernandez, M.; Gomez, G.; Jaramillo Echeverria, R.; Moya, D.; Gonzalez Sanchez, F. J.; Vila, I.; Virto, A. L.; Abbaneo, D.; Ahmed, I.; Albert, E.; Auzinger, G.; Berruti, G.; Bianchi, G.; Blanchot, G.; Bonnaud, J.; Caratelli, A.; Ceresa, D.; Christiansen, J.; Cichy, K.; Daguin, J.; D'Auria, A.; Detraz, S.; Deyrail, D.; Dondelewski, O.; Faccio, F.; Frank, N.; Gadek, T.; Gill, K.; Honma, A.; Hugo, G.; Jara Casas, L. M.; Kaplon, J.; Kornmayer, A.; Kottelat, L.; Kovacs, M.; Krammer, M.; Lenoir, P.; Mannelli, M.; Marchioro, A.; Marconi, S.; Mersi, S.; Martina, S.; Michelis, S.; Moll, M.; Onnela, A.; Orfanelli, S.; Pavis, S.; Peisert, A.; Pernot, J.-F.; Petagna, P.; Petrucciani, G.; Postema, H.; Rose, P.; Tropea, P.; Troska, J.; Tsirou, A.; Vasey, F.; Vichoudis, P.; Verlaat, B.; Zwalinski, L.; Bachmair, F.; Becker, R.; di Calafiori, D.; Casal, B.; Berger, P.; Djambazov, L.; Donega, M.; Grab, C.; Hits, D.; Hoss, J.; Kasieczka, G.; Lustermann, W.; Mangano, B.; Marionneau, M.; Martinez Ruiz del Arbol, P.; Masciovecchio, M.; Meinhard, M.; Perozzi, L.; Roeser, U.; Starodumov, A.; Tavolaro, V.; Wallny, R.; Zhu, D.; Amsler, C.; Bösiger, K.; Caminada, L.; Canelli, F.; Chiochia, V.; de Cosa, A.; Galloni, C.; Hreus, T.; Kilminster, B.; Lange, C.; Maier, R.; Ngadiuba, J.; Pinna, D.; Robmann, P.; Taroni, S.; Yang, Y.; Bertl, W.; Deiters, K.; Erdmann, W.; Horisberger, R.; Kaestli, H.-C.; Kotlinski, D.; Langenegger, U.; Meier, B.; Rohe, T.; Streuli, S.; Cussans, D.; Flacher, H.; Goldstein, J.; Grimes, M.; Jacob, J.; Seif El Nasr-Storey, S.; Cole, J.; Hoad, C.; Hobson, P.; Morton, A.; Reid, I. D.; Auzinger, G.; Bainbridge, R.; Dauncey, P.; Hall, G.; James, T.; Magnan, A.-M.; Pesaresi, M.; Raymond, D. M.; Uchida, K.; Garabedian, A.; Heintz, U.; Narain, M.; Nelson, J.; Sagir, S.; Speer, T.; Swanson, J.; Tersegno, D.; Watson-Daniels, J.; Chertok, M.; Conway, J.; Conway, R.; Flores, C.; Lander, R.; Pellett, D.; Ricci-Tam, F.; Squires, M.; Thomson, J.; Yohay, R.; Burt, K.; Ellison, J.; Hanson, G.; Olmedo, M.; Si, W.; Yates, B. R.; Gerosa, R.; Sharma, V.; Vartak, A.; Yagil, A.; Zevi Della Porta, G.; Dutta, V.; Gouskos, L.; Incandela, J.; Kyre, S.; Mullin, S.; Patterson, A.; Qu, H.; White, D.; Dominguez, A.; Bartek, R.; Cumalat, J. P.; Ford, W. T.; Jensen, F.; Johnson, A.; Krohn, M.; Leontsinis, S.; Mulholland, T.; Stenson, K.; Wagner, S. R.; Apresyan, A.; Bolla, G.; Burkett, K.; Butler, J. N.; Canepa, A.; Cheung, H. W. K.; Chramowicz, J.; Christian, D.; Cooper, W. E.; Deptuch, G.; Derylo, G.; Gingu, C.; Grünendahl, S.; Hasegawa, S.; Hoff, J.; Howell, J.; Hrycyk, M.; Jindariani, S.; Johnson, M.; Kahlid, F.; Lei, C. M.; Lipton, R.; Lopes De Sá, R.; Liu, T.; Los, S.; Matulik, M.; Merkel, P.; Nahn, S.; Prosser, A.; Rivera, R.; Schneider, B.; Sellberg, G.; Shenai, A.; Spiegel, L.; Tran, N.; Uplegger, L.; Voirin, E.; Berry, D. R.; Chen, X.; Ennesser, L.; Evdokimov, A.; Evdokimov, O.; Gerber, C. E.; Hofman, D. J.; Makauda, S.; Mills, C.; Sandoval Gonzalez, I. D.; Alimena, J.; Antonelli, L. J.; Francis, B.; Hart, A.; Hill, C. S.; Parashar, N.; Stupak, J.; Bortoletto, D.; Bubna, M.; Hinton, N.; Jones, M.; Miller, D. H.; Shi, X.; Tan, P.; Baringer, P.; Bean, A.; Khalil, S.; Kropivnitskaya, A.; Majumder, D.; Wilson, G.; Ivanov, A.; Mendis, R.; Mitchell, T.; Skhirtladze, N.; Taylor, R.; Anderson, I.; Fehling, D.; Gritsan, A.; Maksimovic, P.; Martin, C.; Nash, K.; Osherson, M.; Swartz, M.; Xiao, M.; Bloom, K.; Claes, D. R.; Fangmeier, C.; Gonzalez Suarez, R.; Monroy, J.; Siado, J.; Hahn, K.; Sevova, S.; Sung, K.; Trovato, M.; Bartz, E.; Gershtein, Y.; Halkiadakis, E.; Kyriacou, S.; Lath, A.; Nash, K.; Osherson, M.; Schnetzer, S.; Stone, R.; Walker, M.; Malik, S.; Norberg, S.; Ramirez Vargas, J. E.; Alyari, M.; Dolen, J.; Godshalk, A.; Harrington, C.; Iashvili, I.; Kharchilava, A.; Nguyen, D.; Parker, A.; Rappoccio, S.; Roozbahani, B.; Alexander, J.; Chaves, J.; Chu, J.; Dittmer, S.; McDermott, K.; Mirman, N.; Rinkevicius, A.; Ryd, A.; Salvati, E.; Skinnari, L.; Soffi, L.; Tao, Z.; Thom, J.; Tucker, J.; Zientek, M.; Akgün, B.; Ecklund, K. M.; Kilpatrick, M.; Nussbaum, T.; Zabel, J.; Betchart, B.; Covarelli, R.; Demina, R.; Hindrichs, O.; Petrillo, G.; Eusebi, R.; Osipenkov, I.; Perloff, A.; Ulmer, K. A.

    2017-06-01

    The upgrade of the LHC to the High-Luminosity LHC (HL-LHC) is expected to increase the LHC design luminosity by an order of magnitude. This will require silicon tracking detectors with a significantly higher radiation hardness. The CMS Tracker Collaboration has conducted an irradiation and measurement campaign to identify suitable silicon sensor materials and strip designs for the future outer tracker at the CMS experiment. Based on these results, the collaboration has chosen to use n-in-p type silicon sensors and focus further investigations on the optimization of that sensor type. This paper describes the main measurement results and conclusions that motivated this decision.

  19. Enhancement of heat transfer in Czochralski growth of silicon crystals with a chemical cooling technique

    Science.gov (United States)

    Ding, Junling; Liu, Lijun; Zhao, Wenhan

    2017-06-01

    The cost of producing single-crystalline silicon with the Czochralski method can be reduced by promoting the crystal size and/or crystal pulling rate. However, more latent heat of solidification needs to be released from the melt-crystal (m-c) interface during the crystal growth process. In this study, the C-CO2 chemical endothermic reaction is proposed as a novel and efficient cooling technique to solve this problem. Compared with the conventional gas cooling method, C-CO2 endothermic reaction method can significantly enhance the heat transfer in the crystal at the m-c interface. It was found that the heat transfer is more enhanced with a chemical reaction of smaller activation energy, and the m-c interface becomes flatter. The influence of the carbon concentration in the chemical reactive gas flow on the heat removal in the crystal at the m-c interface is also investigated. The cooling effect is significantly increased with the increase in the carbon concentration when it is small. However, when the carbon concentration in the reactive gas is high, the cooling effect just increases slightly. The research demonstrates that the proposed chemical endothermic reaction is a promising cooling technique to be applied in CZ-Si crystal growth with large size/high pulling rate.

  20. Numerical investigation of carbon contamination during the melting process of Czochralski silicon crystal growth

    Science.gov (United States)

    Liu, Xin; Gao, Bing; Kakimoto, Koichi

    2015-05-01

    Czochralski (CZ) growth of single silicon (Si) crystals is invariably accompanied by transport of impurities such as carbon (C), oxygen (O), and related compounds produced by reactions at high temperature. To study the generation and accumulation of C during the melting process, a transient global model was developed that included coupled O and C transport. Transport phenomena of C, O, and related compounds were predicted by considering five chemical reactions in the furnace. The dynamic behavior of impurities was revealed during the melting process of the Si feedstock. It was found that C contamination is activated once the melting front contacts argon gas. For accurate control of C contamination in CZ-Si crystals, the accumulation of C during the melting stage should be considered. Parameter studies of furnace pressure and gas flow rate were conducted on the accumulation of C during the melting stage. At the gas/melt interface, pressure and flow rate affected the C flux in different ways. The results suggest that increase in gas flow rate could reduce C contamination much more effectively than decrease in pressure.

  1. The effects of fast neutron irradiation on oxygen in Czochralski silicon

    Institute of Scientific and Technical Information of China (English)

    Chen Gui-Feng; Yan Wen-Bo; Chen Hong-Jian; Li Xing-Hua; Li Yang-Xian

    2009-01-01

    The effects of fast neutron irradiation on oxygen atoms in Czochralski silicon (CZ-Si) are investigated systemically by using Fourier transform infrared (FTIR) spectrometer and positron annihilation technique (PAT). Through isochronal annealing, it is found that the trend of variation in interstitial oxygen concentration ([Oi]) in fast neutrons irradiated CZ-Si fluctuates largely with temperature increasing, especially between 500 and 700℃. After the CZ-Si is annealed at 600℃, the V4 appearing as three-dimensional vacancy clusters causes the formation of the molecule-like oxygen clusters, and more importantly these dimers with small binding energies (0.1-1.0eV) can diffuse into the Si lattices more easily than single oxygen atoms, thereby leading to the strong oxygen agglomerations. When the CZ-Si is annealed at temperature increasing up to 700℃, three-dimensional vacancy clusters disappear and the oxygen agglomerations decompose into single oxygen atoms (O) at interstitial sites. Results from FTIR spectrometer and PAT provide an insight into the nature of the [Oi] at temperatures between 500 and 700℃. It turns out that the large fluctuation of [Oi] after short-time annealing from 500 to 700℃ results from the transformation of fast neutron irradiation defects.

  2. Effect of tin doping on oxygen- and carbon-related defects in Czochralski silicon

    Energy Technology Data Exchange (ETDEWEB)

    Chroneos, A. [Department of Materials, Imperial College London, London SW7 2AZ (United Kingdom); Londos, C. A.; Sgourou, E. N. [University of Athens, Solid State Physics Section, Panepistimiopolis Zografos, Athens 157 84 (Greece)

    2011-11-01

    Experimental and theoretical techniques are used to investigate the impact of tin doping on the formation and the thermal stability of oxygen- and carbon-related defects in electron-irradiated Czochralski silicon. The results verify previous reports that Sn doping reduces the formation of the VO defect and suppresses its conversion to the VO{sub 2} defect. Within experimental accuracy, a small delay in the growth of the VO{sub 2} defect is observed. Regarding carbon-related defects, it is determined that Sn doping leads to a reduction in the formation of the C{sub i}O{sub i}, C{sub i}C{sub s}, and C{sub i}O{sub i}(Si{sub I}) defects although an increase in their thermal stability is observed. The impact of strain induced in the lattice by the larger tin substitutional atoms, as well as their association with intrinsic defects and carbon impurities, can be considered as an explanation to account for the above observations. The density functional theory calculations are used to study the interaction of tin with lattice vacancies and oxygen- and carbon-related clusters. Both experimental and theoretical results demonstrate that tin co-doping is an efficient defect engineering strategy to suppress detrimental effects because of the presence of oxygen- and carbon-related defect clusters in devices.

  3. Dual ohmic contact to N- and P-type silicon carbide

    Science.gov (United States)

    Okojie, Robert S. (Inventor)

    2013-01-01

    Simultaneous formation of electrical ohmic contacts to silicon carbide (SiC) semiconductor having donor and acceptor impurities (n- and p-type doping, respectively) is disclosed. The innovation provides for ohmic contacts formed on SiC layers having n- and p-doping at one process step during the fabrication of the semiconductor device. Further, the innovation provides a non-discriminatory, universal ohmic contact to both n- and p-type SiC, enhancing reliability of the specific contact resistivity when operated at temperatures in excess of 600.degree. C.

  4. Extraction of interface state density and resistivity of suspended p-type silicon nanobridges

    Institute of Scientific and Technical Information of China (English)

    Zhang Jiahong; Liu Qingquan; Ge Yixian; Gu Fang; Li Min; Mao Xiaoli; Cao Hongxia

    2013-01-01

    The evaluation of the influence of the bending deformation of silicon nanobridges on their electrical properties is crucial for sensing and actuating applications.A combined theory/experimental approach for determining the resistivity and the density of interface states of the bending silicon nanobridges is presented.The suspended p-type silicon nanobridge test structures were fabricated from silicon-on-insulator wafers by using a standard CMOS lithography and anisotropic wet etching release process.After that,we measured the resistance of a set of silicon nanobridges versus their length and width under different bias voltages.In conjunction with a theoretical model,we have finally extracted both the interface state density of and resistivity suspended silicon nanobridges under different bending deformations,and found that the resistivity of silicon nanobridges without bending was 9.45 mΩ·cm and the corresponding interface charge density was around 1.7445 × 1013 cm-2.The bending deformation due to the bias voltage slightly changed the resistivity of the silicon nanobridge,however,it significantly changed the distribution of interface state charges,which strongly depends on the intensity of the stress induced by bending deformation.

  5. Empirical model predicting the layer thickness and porosity of p-type mesoporous silicon

    Science.gov (United States)

    Wolter, Sascha J.; Geisler, Dennis; Hensen, Jan; Köntges, Marc; Kajari-Schröder, Sarah; Bahnemann, Detlef W.; Brendel, Rolf

    2017-04-01

    Porous silicon is a promising material for a wide range of applications because of its versatile layer properties and the convenient preparation by electrochemical etching. Nevertheless, the quantitative dependency of the layer thickness and porosity on the etching process parameters is yet unknown. We have developed an empirical model to predict the porosity and layer thickness of p-type mesoporous silicon prepared by electrochemical etching. The impact of the process parameters such as current density, etching time and concentration of hydrogen fluoride is evaluated by ellipsometry. The main influences on the porosity of the porous silicon are the current density, the etching time and their product while the etch rate is dominated by the current density, the concentration of hydrogen fluoride and their product. The developed model predicts the resulting layer properties of a certain porosification process and can, for example be used to enhance the utilization of the employed chemicals.

  6. Effect of the packing structure of silicon chunks on the melting process and carbon reduction in Czochralski silicon crystal growth

    Science.gov (United States)

    Liu, Xin; Nakano, Satoshi; Kakimoto, Koichi

    2017-06-01

    Carbon (C) contamination in Czochralski silicon (CZ-Si) crystal growth mainly originates from carbon monoxide (CO) generation on the graphite components, which reaches a maximum during the melting stage. Loading a crucible with poly-Si feedstock includes many technical details for optimization of the melting and growth processes. To investigate the effect of the packing structure of Si chunks on C accumulation in CZ-Si crystal growth, transient global simulations of heat and mass transport were performed for the melting process with different packing structures of poly-Si. The heat transport modeling took into account the effective thermal conductivity (ETC) of the Si feedstock, which is affected by the packing structure. The effect of the chunk size on the melting process and C accumulation were investigated by parametric studies of different packing structures. The heat transport and melting process in the crucible were affected by the ETC and the emissivity of the Si feedstock. It was found that smaller Si chunks packed in the upper part could speed up the melting process and smooth the power profile. Decreasing the duration of the melting process is favorable for reduction of C contamination in the Si feedstock. Parametric studies indicated that optimization of the melting process by the packing structure is possible and essential for C reduction in CZ-Si crystal growth.

  7. Investigation of stoichiometry of oxygen precipitates in Czochralski silicon wafers by means of EDX, EELS and FTIR spectroscopy

    Science.gov (United States)

    Kot, D.; Kissinger, G.; Schubert, M. A.; Klingsporn, M.; Huber, A.; Sattler, A.

    2016-11-01

    In this work, we used EDX, EELS and FTIR spectroscopy to investigate the stoichiometry of oxygen precipitates in Czochralski silicon wafers. The EDX analysis of a plate-like precipitate demonstrated that the composition of the precipitate is SiO1.93. This result was confirmed by EELS where the characteristic plasmon peak of SiO2 was observed. Additionally, the absorption band of plate-like precipitates at 1223 cm-1 was found in the FTIR spectrum measured at liquid helium temperature. It was demonstrated that this band can only be simulated by the dielectric constants of amorphous SiO2.

  8. Process design and simulation for optimizing the oxygen concentration in Czochralski-grown single-crystal silicon

    Energy Technology Data Exchange (ETDEWEB)

    Jung, Y. J.; Kim, W. K.; Jung, J. H. [Yeungnam University, Gyeongsan (Korea, Republic of)

    2014-08-15

    The highest-concentration impurity in a single-crystal silicon ingot is oxygen, which infiltrates the ingot during growth stage. This oxygen adversely affects the wafer is quality. This study was aimed at finding an optimal design for the Czochralski (Cz) process to enable high-quality and low cost (by reducing power consumption) wafer production by controlling the oxygen concentration in the silicon ingots. In the Cz process, the characteristics of silicon ingots during crystallization are greatly influenced by the design and the configuration of the hot zone, and by crystallization rate. In order to identify process conditions for obtaining an optimal oxygen concentration of 11 - 13 ppma (required for industrial-grade ingots), designed two shield shapes for the hot zone. Furthermore, oxygen concentrations corresponding to these two shapes were compared by evaluating each shape at five different production speeds. In addition, simulations were performed to identify the optimal shield design for industrial applications.

  9. Processing of n{sup +}/p{sup −}/p{sup +} strip detectors with atomic layer deposition (ALD) grown Al{sub 2}O{sub 3} field insulator on magnetic Czochralski silicon (MCz-si) substrates

    Energy Technology Data Exchange (ETDEWEB)

    Härkönen, J., E-mail: jaakko.harkonen@helsinki.fi [Helsinki Institute of Physics (Finland); Tuovinen, E. [Helsinki Institute of Physics (Finland); VTT Technical Research Centre of Finland, Microsystems and Nanoelectronics (Finland); Luukka, P.; Gädda, A.; Mäenpää, T.; Tuominen, E.; Arsenovich, T. [Helsinki Institute of Physics (Finland); Junkes, A. [Institute for Experimental Physics, University of Hamburg (Germany); Wu, X. [VTT Technical Research Centre of Finland, Microsystems and Nanoelectronics (Finland); Picosun Oy, Tietotie 3, FI-02150 Espoo Finland (Finland); Li, Z. [School of Materials Science and Engineering, Xiangtan University, Xiangtan, Hunan 411105 (China)

    2016-08-21

    Detectors manufactured on p-type silicon material are known to have significant advantages in very harsh radiation environment over n-type detectors, traditionally used in High Energy Physics experiments for particle tracking. In p-type (n{sup +} segmentation on p substrate) position-sensitive strip detectors, however, the fixed oxide charge in the silicon dioxide is positive and, thus, causes electron accumulation at the Si/SiO{sub 2} interface. As a result, unless appropriate interstrip isolation is applied, the n-type strips are short-circuited. Widely adopted methods to terminate surface electron accumulation are segmented p-stop or p-spray field implantations. A different approach to overcome the near-surface electron accumulation at the interface of silicon dioxide and p-type silicon is to deposit a thin film field insulator with negative oxide charge. We have processed silicon strip detectors on p-type Magnetic Czochralski silicon (MCz-Si) substrates with aluminum oxide (Al{sub 2}O{sub 3}) thin film insulator, grown with Atomic Layer Deposition (ALD) method. The electrical characterization by current–voltage and capacitance−voltage measurement shows reliable performance of the aluminum oxide. The final proof of concept was obtained at the test beam with 200 GeV/c muons. For the non-irradiated detector the charge collection efficiency (CCE) was nearly 100% with a signal-to-noise ratio (S/N) of about 40, whereas for the 2×10{sup 15} n{sub eq}/cm{sup 2} proton irradiated detector the CCE was 35%, when the sensor was biased at 500 V. These results are comparable with the results from p-type detectors with the p-spray and p-stop interstrip isolation techniques. In addition, interestingly, when the aluminum oxide was irradiated with Co-60 gamma-rays, an accumulation of negative fixed oxide charge in the oxide was observed.

  10. Use of hexamethyldisiloxane for p-type microcrystalline silicon oxycarbide layers

    Directory of Open Access Journals (Sweden)

    Goyal Prabal

    2016-01-01

    Full Text Available The use of hexamethyldisiloxane (HMDSO as an oxygen source for the growth of p-type silicon-based layers deposited by Plasma Enhanced Chemical Vapor Deposition is evaluated. The use of this source led to the incorporation of almost equivalent amounts of oxygen and carbon, resulting in microcrystalline silicon oxycarbide thin films. The layers were examined with characterisation techniques including Spectroscopic Ellipsometry, Dark Conductivity, Fourier Transform Infrared Spectroscopy, Secondary Ion Mass Spectrometry and Transmission Electron Microscopy to check material composition and structure. Materials studies show that the refractive indices of the layers can be tuned over the range from 2.5 to 3.85 (measured at 600 nm and in-plane dark conductivities over the range from 10-8 S/cm to 1 S/cm, suggesting that these doped layers are suitable for solar cell applications. The p-type layers were tested in single junction amorphous silicon p-i-n type solar cells.

  11. About the Nature of Electroluminescence Centers in Plastically Deformed Crystals of p-type Silicon

    Directory of Open Access Journals (Sweden)

    B.V. Pavlyk

    2015-10-01

    Full Text Available The paper describes research of dislocation electroluminescence of single crystal p-type silicon with a high concentration of dislocations on the surface (111. It is shown the reaction of the luminescence spectra and capacitive-modulation spectra of samples after high-temperature annealing in an atmosphere of flowing oxygen. The analysis of the results lets us to establish the nature of recombination centers and their reorganization under high-temperature annealing. It is shown that deposition of Al film on the substrate p-Si leads to the formation of strain capacity and the localization of defects in the surface layer that corresponds to luminescence centers.

  12. Nanopore formation on low-doped p-type silicon under illumination

    Energy Technology Data Exchange (ETDEWEB)

    Chiboub, N. [UDTS, 02 Bd. Frantz Fanon, B.P. 140, Alger-7 Merveilles, 16200 Algiers (Algeria); Gabouze, N., E-mail: ngabouze@yahoo.fr [UDTS, 02 Bd. Frantz Fanon, B.P. 140, Alger-7 Merveilles, 16200 Algiers (Algeria); Chazalviel, J.-N.; Ozanam, F. [Physique de la Matiere Condensee, Ecole Polytechnique, CNRS, 91128 Palaiseau (France); Moulay, S. [Universite Saad Dahleby, B.P. 270, Route de Soumaa, Blida (Algeria); Manseri, A. [UDTS, 02 Bd. Frantz Fanon, B.P. 140, Alger-7 Merveilles, 16200 Algiers (Algeria)

    2010-04-01

    Porous silicon layers were elaborated by anodization of highly resistive p-type silicon in HF/ethylene glycol solution under front side illumination, as a function of etching time, HF concentration and illumination intensity. The porous layer morphology was investigated by scanning electron microscopy (SEM). The illumination during anodization was provided by a tungsten lamp or lasers of different wavelengths. Under anodization, a microporous layer is formed up to a critical thickness above which macropores appear. Under illumination, the instability limiting the growth of the microporous layer occurs at a critical thickness much larger than in the dark. This critical thickness depends on HF concentration, illumination wavelength and intensity. These non-trivial dependencies are rationalized in a model in which photochemical etching in the electrochemically formed porous layer plays the central role.

  13. Improving the radiation hardness properties of silicon detectors using oxygenated n-type and p-type silicon

    CERN Document Server

    Casse, G L; Hanlon, M

    2000-01-01

    The degradation of the electrical properties of silicon detectors exposed to 24 GeV/c protons were studied using pad diodes made from different silicon materials. Standard high-grade p-type and n-type substrates and oxygenated n-type substrates have been used. The diodes were studied in terms of reverse current (I/sub r/) and full depletion voltage (V/sub fd/) as a function of fluence. The oxygenated devices from different suppliers with a variety of starting materials and techniques, all show a consistent improvement of the degradation rate of V/sub fd/ and CCE compared to un- oxygenated substrate devices. Radiation damage of n-type detectors introduces stable defects acting as effective p-type doping and leads to the change of the conductivity type of the silicon bulk (type inversion) at a neutron equivalent fluence of a few 10/sup 13/ cm/sup -2/. The diode junction after inversion migrates from the original side to the back plane of the detector. The migration of the junction is avoided using silicon detec...

  14. Solar cells on low-resistivity boron-doped Czochralski-grown silicon with stabilized efficiencies of 20%

    Science.gov (United States)

    Lim, Bianca; Hermann, Sonja; Bothe, Karsten; Schmidt, Jan; Brendel, Rolf

    2008-10-01

    Recently, it was shown that the boron-oxygen complex responsible for the light-induced lifetime degradation in oxygen-rich boron-doped silicon can be permanently deactivated by illumination at elevated temperatures. Since the degradation is particularly harmful in low-resistivity Czochralski silicon (Cz-Si), we apply the deactivation procedure to a high-efficiency rear interdigitated single evaporation emitter wrap-through solar cell made on 1.4Ωcm B-doped Cz-Si. The energy conversion efficiency is thereby increased by more than 1% absolute compared to the degraded state to 20.3% on a designated area of 92cm2 and is furthermore shown to be stable under illumination at room temperature.

  15. Lateral photovoltaic effect in p-type silicon induced by surface states

    Science.gov (United States)

    Huang, Xu; Mei, Chunlian; Gan, Zhikai; Zhou, Peiqi; Wang, Hui

    2017-03-01

    A colossal lateral photovoltaic effect (LPE) was observed at the surface of p-type silicon, which differs from the conventional thought that a large LPE is only observed in Schottky junctions and PN junctions consisting of several layers with different conductivities. It shows a high sensitivity of 499.24 mV/mm and an ultra-broadband spectral responsivity (from 405 nm to 980 nm) at room temperature, which makes it an attractive candidate for near-infrared detection. We propose that this phenomenon can be understood by considering the surface band bending near the surface of p-Si induced by charged surface states. The energy band diagrams of the samples are shown based on X-ray photoelectron spectroscopy suggesting the correlation between the LPE and surface band bending. The conjectures are validated by changing the surface states of p-type silicon using Ni nano-films. These findings reveal a generation mechanism of the LPE and may lead to p-Si based, broadband-responsivity, low-cost, and high-precision optical and optoelectronic applications.

  16. Processing experiments on non-Czochralski silicon sheet (MEPSDU support contract). Quarterly technical report No. 1, 14 October 1980-31 December 1980

    Energy Technology Data Exchange (ETDEWEB)

    Pryor, R.

    1980-01-01

    A program of six months duration has been initiated to support and promote the further development of processing techniques which may be successfully and cost-effectively applied to low-cost non-Czochralski silicon sheet for solar cell fabrication. Work is proceeding and results are reported in the areas of process technology, cell design, cell metallization, and production cost simulation.

  17. Development of advanced Czochralski Growth Process to produce low cost 150 KG silicon ingots from a single crucible for technology readiness

    Science.gov (United States)

    1981-01-01

    The goals in this program for advanced czochralski growth process to produce low cost 150 kg silicon ingots from a single crucible for technology readiness are outlined. To provide a modified CG2000 crystal power capable of pulling a minimum of five crystals, each of approximately 30 kg in weight, 150 mm diameter from a single crucible with periodic melt replenishment. Crystals to have: resistivity of 1 to 3 ohm cm, p-type; dislocation density below 1- to the 6th power per cm; orientation (100); after growth yield of greater than 90%. Growth throughput of greater than 2.5 kg per hour of machine operation using a radiation shield. Prototype equipment suitable for use as a production facility. The overall cost goal is $.70 per peak watt by 1986. To accomplish these goals, the modified CG2000 grower and development program includes: (1) increased automation with a microprocessor based control system; (2) sensors development which will increase the capability of the automatic controls system, and provide technology transfer of the developed systems.

  18. Electrical band-gap narrowing in n- and p-type heavily doped silicon at 300 K

    Science.gov (United States)

    Van Cong, H.; Brunet, S.

    1986-09-01

    Based on previous results band-gap narrowing in heavily doped silicon at 300 K is investigated and expressed in terms of impurity size-and-doping effects. The results obtained for n- and p-type heavily doped silicon are compared with other theories and experiments.

  19. A re-examination of cobalt-related defects in n- and p-type silicon

    Energy Technology Data Exchange (ETDEWEB)

    Scheffler, Leopold; Kolkovsky, Vladimir; Weber, Joerg [Technische Universitaet Dresden, 01069 Dresden (Germany)

    2012-10-15

    In the present work cobalt-doped n- and p-type silicon samples were studied by means of deep level transient spectroscopy (DLTS) and Laplace-DLTS (LDLTS). We demonstrate that two dominant DLTS peaks previously assigned to a substitutional Co defect have different annealing behaviour and therefore belong to different defects. After wet chemical etching three other peaks (E90, E140 and H160) were observed in the samples. The intensity of the peaks becomes larger in the H-plasma treated samples. This together with depth profiling demonstrates that the peaks are hydrogen-related defects. The origin of the peaks will be discussed. (Copyright copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  20. The development of p-type silicon detectors for the high radiation regions of the LHC

    CERN Document Server

    Hanlon, M D L

    1998-01-01

    This thesis describes the production and characterisation of silicon microstrip detectors and test structures on p-type substrates. An account is given of the production and full parameterisation of a p-type microstrip detector, incorporating the ATLAS-A geometry in a beam test. This detector is an AC coupled device incorporating a continuous p-stop isolation frame and polysilicon biasing and is typical of n-strip devices proposed for operation at the LHC. It was successfully read out using the FELix-128 analogue pipeline chip and a signal to noise (s/n) of 17+-1 is reported, along with a spatial resolution of 14.6+-0.2 mu m. Diode test structures were fabricated on both high resistivity float zone material and on epitaxial material and subsequently irradiated with 24 GeV protons at the CERN PS up to a dose of (8.22+-0.23) x 10 sup 1 sup 4 per cm sup 2. An account of the measurement program is presented along with results on the changes in the effective doping concentration (N sub e sub f sub f) with irradiat...

  1. Performance of a double metal n-on-n and a Czochralski silicon strip detector read out at 40 MHz

    CERN Document Server

    Palacios, J P; Buytaert, J; Collins, P; Eckstein, D; Härkönen, J; Luukka, Panja; Parkes, C; Tuovinen, E

    2004-01-01

    The R&D undertaken by the VELO group in order to produce a sensor that satisfies the tight radiation hardness, efficiency, resolution and low material requirements of LHCb has resulted in the choice of an n-on-n double metal layer solution. First, measurements of the performance of the latest prototype and its related front end electronics, designed to function at the LHC speed of 40 MHz, are presented here. In addition, research has been carried out into new materials which could retain good performance in high-radiation environments at and beyond the LHC, and could provide an alternative for a possible VELO upgrade. For the first time, a full size Czochralski silicon detector sample with 50 mum pitch strips has been irradiated with high energy protons and its performance has been measured in a test beam with 40 MHz electronics. The results of this test will be presented.

  2. Performance of a double metal n-on-n and a Czochralski silicon strip detector read out at 40 MHz

    CERN Document Server

    Palacios, J P; Buytaert, J; Collins, P; Eckstein, D; Harkonen, J; Tuovinen, E; Luukka, P

    2006-01-01

    The R&D undertaken by the VELO group in order to produce a sensor that satisfies the tight radiation hardness, efficiency, resolution and low material requirements of LHCb has resulted in the choice of an n-on-n double metal layer solution. First measurements of the performance of the latest prototype and its related front end electronics, designed to function at the LHC speed of 40 MHz, are presented here. In addition, research has been carried out into new materials which could retain good performance in high radiation environments at and beyond the LHC, and could provide an alternative for a possible VELO upgrade. For the first time a full size Czochralski silicon detector sample with 50$\\mu$m pitch strips has been irradiated with high energy protons and its performance has been measured in a test beam with 40 MHz electronics. The results of this test will be presented.

  3. RF performances of inductors integrated on localized p+-type porous silicon regions

    National Research Council Canada - National Science Library

    Capelle, Marie; Billoué, Jérôme; Poveda, Patrick; Gautier, Gaël

    2012-01-01

    To study the influence of localized porous silicon regions on radiofrequency performances of passive devices, inductors were integrated on localized porous silicon regions, full porous silicon sheet...

  4. Modelling of the Czochralski flow

    OpenAIRE

    Jan Franc

    1998-01-01

    The Czochralski method of the industrial production of a silicon single crystal consists of pulling up the single crystal from the silicon melt. The flow of the melt during the production is called the Czochralski flow. The mathematical description of the flow consists of a coupled system of six P.D.E. in cylindrical coordinates containing Navier-Stokes equations (with the stream function), heat convection-conduction equations, convection-diffusion equation for oxygen impurity and an equation...

  5. First results on charge collection efficiency of heavily irradiated microstrip sensors fabricated on oxygenated p-type silicon

    Energy Technology Data Exchange (ETDEWEB)

    Casse, G. E-mail: gcasse@hep.ph.liv.ac.uk; Allport, P.P.; Marti i Garcia, S.; Lozano, M.; Turner, P.R

    2004-02-01

    Heavy hadron irradiation leads to type inversion of n-type silicon detectors. After type inversion, the charge collected at low bias voltages by silicon microstrip detectors is higher when read out from the n-side compared to p-side read out. The n-side read out has been successfully used in combination with oxygen-enriched n-type silicon substrate to maximise the radiation hardness of microstrip detectors. Alternatively, the n-side read out can be implemented on p-type substrates reducing the complexity of fabrication. Miniature silicon microstrip detectors made on standard and oxygen-enriched p-type substrate have been produced. The charge collection properties of such detectors with and without oxygenation are here compared for the first time after severe charged hadron irradiation.

  6. Investigations of nanoreactors on the basis of p-type porous silicon: Electron structure and phase composition

    Energy Technology Data Exchange (ETDEWEB)

    Lenshin, A.S. [Voronezh State University, Solid State Physics and Nanostructures Department, Universitetskaya pl. 1, Voronezh 394006 (Russian Federation); Kashkarov, V.M., E-mail: kash@phys.vsu.ru [Voronezh State University, Solid State Physics and Nanostructures Department, Universitetskaya pl. 1, Voronezh 394006 (Russian Federation); Spivak, Yu. M. [SPbGETU ' LETI' , Department of Microelectronics (Russian Federation); Moshnikov, V.A., E-mail: vamoshnikov@mail.ru [SPbGETU ' LETI' , Department of Microelectronics (Russian Federation)

    2012-08-15

    Investigations of the electron structure and phase composition of the surface layers in porous silicon with a developed system of nanopores were made with the use of ultrasoft X-ray spectroscopy and X-ray photoelectron spectroscopy. The samples of porous silicon were obtained on the substrates with p-type conductivity under different modes of electrochemical etching. Porous surface layer represents a system of weakly connected pores oriented mainly perpendicular to the surface of silicon wafer. The mean transverse pore dimension is of {approx}50 nm. Silicon dioxide and sub-oxide were found in porous layer. We assume that these phases cover pores surface thus providing a possibility of the use of the structures as nanoreactors. -- Highlights: Black-Right-Pointing-Pointer Nanoporous silicon layers were obtained. Black-Right-Pointing-Pointer A system of weakly connected pores was detected. Black-Right-Pointing-Pointer Electron structure and phase composition of the surface layers in porous silicon were investigated.

  7. Analysis of the effect of symmetric/asymmetric CUSP magnetic fields on melt/crystal interface during Czochralski silicon growth

    Science.gov (United States)

    Daggolu, Parthiv; Ryu, Jae Woo; Galyukov, Alex; Kondratyev, Alexey

    2016-10-01

    With the use of 300 mm silicon wafers for industrial semiconductor device manufacturing, the Czochralski (Cz) crystal growth process has to be optimized to achieve higher quality and productivity. Numerical studies based on 2D global thermal models combined with 3D simulation of melt convection are widely used today to save time and money in the process development. Melt convection in large scale Cz Si growth is controlled by a CUSP or transversal magnetic field (MF) to suppress the melt turbulence. MF can be optimized to meet necessary characteristics of the growing crystal, in terms of point defects, as MF affects the melt/crystal interface geometry and allows adjustment of the pulling rate. Among the different knobs associated with the CUSP magnetic field, the nature of its configuration, going from symmetric to asymmetric, is also reported to be an important tool for the control of crystallization front. Using a 3D unsteady model of the CGSim software, we have studied these effects and compared with several experimental results. In addition, physical mechanisms behind these observations are explored through a detailed modeling analysis of the effect of an asymmetric CUSP MF on convection features governing the heat transport in the silicon melt.

  8. TEM Observation of the Dislocations Nucleated from Cracks inside Lightly or Heavily Doped Czochralski Silicon Wafers

    Directory of Open Access Journals (Sweden)

    Seiji Shiba

    2011-01-01

    Full Text Available The crack propagation from the indent introduced with a Vickers hardness tester at room temperature and the dislocation nucleation from the cracks at 900°C inside lightly boron (B, heavily B, or heavily arsenic (As doped Czochralski (CZ Si wafers were investigated with transmission electron microscopy (TEM observations. It was found that the dopant concentration and the dopant type did not significantly affect the crack propagation and the dislocation nucleation. The slip dislocations with a density of about (0.8∼2.8 × 1013/cm3 were nucleated from the cracks propagated about 10 μm in depth. Furthermore, small dislocations that nucleated with very high density and without cracks were found around the indent introduced at 1000°C.

  9. Investigating the effect of carbon on oxygen behavior in n-type Czochralski silicon for PV application

    Science.gov (United States)

    Zhang, Song; Juel, Mari; Øvrelid, Eivind Johannes; Tranell, Gabriella

    2015-02-01

    The objective of the current work was to understand the effect of carbon as an impurity in silicon in terms of the formation of as-grown oxygen defects and the subsequent behavior of these defects in n-type Czochralski (Cz) silicon during heat treatment. Three n-type Cz ingots with different carbon levels were used in the investigation. Copper decoration was used to quantify the number of as-grown defects, while a two-step oxidation process (4 h at 750 °C and 16h at 1050 °C) was used to study the evolution of as-grown defects, that is, the formation and morphology of oxygen precipitates (stacking faults and smaller precipitates) in the silicon during heat treatment. Carrier Density Imaging (CDI) revealed the defect distribution and distinguished their states. Results from the study show that substitutional carbon enhances the etch pit density on the copper decorated samples; indicating an enhanced concentration of defects when the carbon level in the material increases. The higher number density but smaller size as-grown oxygen defects is concluded to be induced by the presence of substitutional carbon, given the oxygen precipitate formation pattern and morphology. Vacancies introduced by carbon did not, however, affect the density of voids significantly and we hence conclude that vacancies were largely consumed by the formation of oxygen complexes, as illustrated by the presence of a higher number density of as-grown oxygen defects in samples with a high carbon concentration. The highest effective minority carrier lifetime of as-grown wafers after amorphous-Si (a-Si) passivation was found on the sample with the highest carbon concentration, and the lifetime in the all samples showed stronger dependence on the oxygen concentration than on the carbon content.

  10. Control of heat transfer in continuous-feeding Czochralski-silicon crystal growth with a water-cooled jacket

    Science.gov (United States)

    Zhao, Wenhan; Liu, Lijun

    2017-01-01

    The continuous-feeding Czochralski method is an effective method to reduce the cost of single crystal silicon. By promoting the crystal growth rate, the cost can be reduced further. However, more latent heat will be released at the melt-crystal interface under a high crystal growth rate. In this study, a water-cooled jacket was applied to enhance the heat transfer at the melt-crystal interface. Quasi-steady-state numerical calculation was employed to investigate the impact of the water-cooled jacket on the heat transfer at the melt-crystal interface. Latent heat released during the crystal growth process at the melt-crystal interface and absorbed during feedstock melting at the feeding zone was modeled in the simulations. The results show that, by using the water-cooled jacket, heat transfer in the growing crystal is enhanced significantly. Melt-crystal interface deflection and thermal stress increase simultaneously due to the increase of radial temperature at the melt-crystal interface. With a modified heat shield design, heat transfer at the melt-crystal interface is well controlled. The crystal growth rate can be increased by 20%.

  11. Effect of Etching Time on Optical and Thermal Properties of p-Type Porous Silicon Prepared by Electrical Anodisation Method

    Directory of Open Access Journals (Sweden)

    Kasra Behzad

    2012-01-01

    Full Text Available The porous silicon (PSi layers were formed on p-type silicon (Si wafer. The six samples were anodised electrically with 30 mA/cm2 fixed current density for different etching times. The structural, optical, and thermal properties of porous silicon on silicon substrates were investigated by photoluminescence (PL, photoacoustic spectroscopy (PAS, and UV-Vis-NIR spectrophotometer. The thickness and porosity of the layers were measured using the gravimetric method. The band gap of the samples was measured through the photoluminescence (PL peak and absorption spectra, then they were compared. It shows that band gap value increases by raising the porosity. Photoacoustic spectroscopy (PAS was carried out for measuring the thermal diffusivity (TD of the samples.

  12. Simulation of V/G During Φ450 mm Czochralski Grown Silicon Single Crystal Growth Under the Different Crystal and Crucible Rotation Rates

    Directory of Open Access Journals (Sweden)

    Guan X J

    2016-01-01

    Full Text Available For discovering the principle of processing parameter combination for the stable growth and better wafer quality of Φ450 mm Czochralski grown silicon single crystal (shortly called Cz silicon crystal, the effects of crystal rotation rate and crucible one on the V/G ratio were simulated by using CGSim software. The results show that their effect laws on the V/G ratio for Φ450 mm Cz silicon crystal growth are some different from that for Φ200 mm Cz silicon one, and the effects of crucible rotation rate are relatively smaller than that of crystal one and its increasing only makes the demarcation point between two regions with different V/G ratio variations outward move along radial direction, and it promotes the wafer quality to weaken crystal rotation rate and strengthen crucible one.

  13. Modelling of the Czochralski flow

    Directory of Open Access Journals (Sweden)

    Jan Franc

    1998-01-01

    Full Text Available The Czochralski method of the industrial production of a silicon single crystal consists of pulling up the single crystal from the silicon melt. The flow of the melt during the production is called the Czochralski flow. The mathematical description of the flow consists of a coupled system of six P.D.E. in cylindrical coordinates containing Navier-Stokes equations (with the stream function, heat convection-conduction equations, convection-diffusion equation for oxygen impurity and an equation describing magnetic field effect.

  14. Hot-wire chemical vapor deposition prepared aluminum doped p-type microcrystalline silicon carbide window layers for thin film silicon solar cells

    Science.gov (United States)

    Chen, Tao; Köhler, Florian; Heidt, Anna; Carius, Reinhard; Finger, Friedhelm

    2014-01-01

    Al-doped p-type microcrystalline silicon carbide (µc-SiC:H) thin films were deposited by hot-wire chemical vapor deposition at substrate temperatures below 400 °C. Monomethylsilane (MMS) highly diluted in hydrogen was used as the SiC source in favor of SiC deposition in a stoichiometric form. Aluminum (Al) introduced from trimethylaluminum (TMAl) was used as the p-type dopant. The material property of Al-doped p-type µc-SiC:H thin films deposited with different deposition pressure and filament temperature was investigated in this work. Such µc-SiC:H material is of mainly cubic (3C) SiC polytype. For certain conditions, like high deposition pressure and high filament temperature, additional hexagonal phase and/or stacking faults can be observed. P-type µc-SiC:H thin films with optical band gap E04 ranging from 2.0 to 2.8 eV and dark conductivity ranging from 10-5 to 0.1 S/cm can be prepared. Such transparent and conductive p-type µc-SiC:H thin films were applied in thin film silicon solar cells as the window layer, resulting in an improved quantum efficiency at wavelengths below 480 nm.

  15. Primary defect transformations in high-resistivity p-type silicon irradiated with electrons at cryogenic temperatures

    CERN Document Server

    Makarenko, L F; Korshunov, F P; Murin, L I; Moll, M

    2009-01-01

    It has been revealed that self-interstitials formed under low intensity electron irradiationin high resistivity p-type silicon can be retained frozen up to room temperature. Low thermal mobility of the self-interstitials suggests that Frenkelpair sinsilicon can be stable at temperatures of about or higher than 100K. A broad DLTS peak with activation energy of 0.14–0.17eV can be identified as related to Frenkel pairs. This peak anneals out at temperatures of 120 140K. Experimental evidences are presented that be coming more mobile under forwardcurrent injection the self-interstitials change their charge state to a less positive one.

  16. Primary defect transformations in high-resistivity p-type silicon irradiated with electrons at cryogenic temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Makarenko, L.F., E-mail: makarenko@bsu.b [Department of Applied Mathematics and Computer Science, Belarusian State University, Independence Ave. 4, 220030 Minsk (Belarus); Lastovski, S.B.; Korshunov, F.P.; Murin, L.I. [Scientific-Practical Materials Research Centre of NAS of Belarus, Minsk (Belarus); Moll, M. [CERN, Geneva (Switzerland)

    2009-12-15

    It has been revealed that self-interstitials formed under low intensity electron irradiation in high resistivity p-type silicon can be retained frozen up to room temperature. Low thermal mobility of the self-interstitials suggests that Frenkel pairs in silicon can be stable at temperatures of about or higher than 100 K. A broad DLTS peak with activation energy of 0.14-0.17 eV can be identified as related to Frenkel pairs. This peak anneals out at temperatures of 120-140 K. Experimental evidences are presented that becoming more mobile under forward current injection the self-interstitials change their charge state to a less positive one.

  17. Ultrasonic study of point defects in electron-irradiated p-type silicon

    Energy Technology Data Exchange (ETDEWEB)

    Johnson, W.L.

    1987-01-01

    The mechanisms of interaction of ultrasonic waves with point defects in crystals are reviewed, and a perturbation approach is introduced that leads to general expressions for the resonance and relaxation strengths in terms of matrix elements of the ultrasonic perturbation. These expressions provide the basis for a discussion of the polarization dependence of resonance and relaxation. Selection rules for cubic crystals are presented. An exploratory ultrasonic study is performed on electron-irradiated B-doped and Al-doped silicon. Neutral substitutional boron is detected before irradiation, as expected from previous ultrasonic studies on unirradiated silicon. This defect produces both resonance and relaxation. Similar effects are observed for substitutional aluminum. After irradiation, a relaxation is observed when the sample is exposed to 0.18-0.39 eV light. By comparison with previous EPR results, this relaxation is identified as the singly positively charged state of the vacancy, V/sup +/. Preliminary results on the relaxation time and strength of V/sup +/ suggest that it may have several populated vibronic levels. Another relaxation is observed in irradiated Al-doped silicon when the sample is exposed to white light. From its annealing behavior and dopant dependence, it is identified as a nonequilibrium charge state of interstitial aluminum.

  18. Photon-Enhanced Thermionic Emission in Cesiated p-Type and n-Type Silicon

    DEFF Research Database (Denmark)

    Reck, Kasper; Dionigi, Fabio; Hansen, Ole

    2014-01-01

    electrons. Efficiencies above 60% have been predicted theoretically for high solar concentration systems. Silicon is an interesting absorber material for high efficiency PETE solar cells, partly due to its mechanical and thermal properties and partly due to its electrical properties, including a close......Photon-enhanced thermionic emission (PETE) is a relatively new concept for high efficiency solar cells that utilize not only the energy of electrons excited across the band gap by photons, as in conventional photovoltaic solar cells, but also the energy usual lost to thermalization of the excited...

  19. P-stop isolation study of irradiated n-in-p type silicon strip sensors for harsh radiation environment

    CERN Document Server

    AUTHOR|(CDS)2084505

    2015-01-01

    In order to determine the most radiation hard silicon sensors for the CMS Experiment after the Phase II Upgrade in 2023 a comprehensive study of silicon sensors after a fluence of up to $1.5\\times10^{15} n_{eq}/cm^{2}$ corresponding to $3000 fb^{-1}$ after the HL-LHC era has been carried out. The results led to the decision that the future Outer Tracker (20~cm${<}R{<}$110~cm) of CMS will consist of n-in-p type sensors. This technology is more radiation hard but also the manufacturing is more challenging compared to p-in-n type sensors due to additional process steps in order to suppress the accumulation of electrons between the readout strips. One possible isolation technique of adjacent strips is the p-stop structure which is a p-type material implantation with a certain pattern for each individual strip. However, electrical breakdown and charge collection studies indicate that the process parameters of the p-stop structure have to be carefully calibrated in order to achieve a sufficient strip isolatio...

  20. Short p-type silicon microstrip detectors in 3D-stc technology

    Energy Technology Data Exchange (ETDEWEB)

    Eckert, S. [Physikalisches Institut, Albert-Ludwigs-Universitaet Freiburg, Hermann-Herder Strasse 3b, D-79104 Freiburg i. Br. (Germany)], E-mail: simon.eckert@physik.uni-freiburg.de; Jakobs, K.; Kuehn, S.; Parzefall, U. [Physikalisches Institut, Albert-Ludwigs-Universitaet Freiburg, Hermann-Herder Strasse 3b, D-79104 Freiburg i. Br. (Germany); Dalla-Betta, G.-F.; Zoboli, A. [Dipartimento di Ingegneria e Scienza dell' Informazione, Universita degli Studi di Trento, via Sommarive 14, I-38050 Povo di Trento (Italy); Pozza, A.; Zorzi, N. [FBK-irst Trento, Microsystems Division, via Sommarive 18, I-38050 Povo di Trento (Italy)

    2008-10-21

    The luminosity upgrade of the Large Hadron Collider (LHC), the sLHC, will constitute an extremely challenging radiation environment for tracking detectors. Significant improvements in radiation hardness are needed to cope with the increased radiation dose, requiring new tracking detectors. In the upgraded ATLAS detector the region from 20 to 50 cm distance to the beam will be covered by silicon strip detectors (SSD) with short strips. These will have to withstand a 1 MeV neutron equivalent fluence of about 1x10{sup 15}n{sub eq}/cm{sup 2}, hence extreme radiation resistance is necessary. For the short strips, we propose to use SSD realised in the radiation tolerant 3D technology, where rows of columns-etched into the silicon bulk-are joined together to form strips. To demonstrate the feasibility of 3D SSD for the sLHC, we have built prototype modules using 3D-single-type-column (stc) SSD with short strips and front-end electronics from the present ATLAS SCT. The modules were read out with the SCT Data Acquisition system and tested with an IR-laser. We report on the performance of these 3D modules, in particular the noise at 40 MHz which constitutes a measurement of the effective detector capacitance. Conclusions about options for using 3D SSD detectors for tracking at the sLHC are drawn.

  1. Correlation Between the Raman Crystallinity of p-Type Micro-Crystalline Silicon Layer and Open Circuit Voltage of n-i-p Solar Cells.

    Science.gov (United States)

    Jung, Junhee; Kim, Sunbo; Park, Jinjoo; Shin, Chonghoon; Pham, Duy Phong; Kim, Jiwoong; Chung, Sungyoun; Lee, Youngseok; Yi, Junsin

    2015-10-01

    This article mainly discusses the difference between p-i-n and n-i-p type solar cells. Their structural difference has an effect on cell performance, such as open circuit voltage and fill factor. Although the deposition conditions are the same for both p-i-n and n-i-p cases, the substrate layers for depositing p-type microcrystalline silicon layers differ. In n-i-p cells, the substrate layer is p-type amorphous silicon oxide layer; whereas, in p-i-n cells, the substrate layer is ZnO:Al. The interfacial change leads to a 12% difference in the crystallinity of the p-type microcrystalline silicon layers. When the p-type microcrystalline silicon layer's crystallinity was not sufficient to activate an internal electric field, the open circuit voltage and fill factor decreased 0.075 V and 7.36%, respectively. We analyzed this problem by comparing the Raman spectra, electrical conductivity, activation energy and solar cell performance. By adjusting the thickness of the p-type microcrystalline silicon layer, we increased the open circuit voltage of the n-i-p cell from 0.835 to 0.91 V.

  2. Very low surface recombination velocities on p-type silicon wafers passivated with a dielectric with fixed negative charge

    Energy Technology Data Exchange (ETDEWEB)

    Agostinelli, G.; Delabie, A.; Dekkers, H.F.W.; De Wolf, S.; Beaucarne, G. [IMEC vzw, Kapeldreef 75, Leuven (Belgium); Vitanov, P.; Alexieva, Z. [CL SENES, Sofia (Bulgaria)

    2006-11-23

    Surface recombination velocities as low as 10cm/s have been obtained by treated atomic layer deposition (ALD) of Al{sub 2}O{sub 3} layers on p-type CZ silicon wafers. Low surface recombination is achieved by means of field induced surface passivation due to a high density of negative charges stored at the interface. In comparison to a diffused back surface field, an external field source allows for higher band bending, that is, a better performance. While this process yields state of the art results, it is not suited for large-scale production. Preliminary results on an industrially viable, alternative process based on a pseudo-binary system containing Al{sub 2}O{sub 3} are presented, too. With this process, surface recombination velocities of 500-1000cm/s have been attained on mc-Si wafers. (author)

  3. Hadron-therapy beam monitoring: Towards a new generation of ultra-thin p-type silicon strip detectors

    Energy Technology Data Exchange (ETDEWEB)

    Bouterfa, M.; Aouadi, K. [Inst. of Information and Communication Technologies, Electronics and Applied Mathematics ICTEAM, Universite Catholique de Louvain, 1348 Louvain-la-Neuve (Belgium); Bertrand, D. [Particle Therapy Dept., Ion Beam Application IBA, 1348 Louvain-la-Neuve (Belgium); Olbrechts, B.; Delamare, R. [Inst. of Information and Communication Technologies, Electronics and Applied Mathematics ICTEAM, Universite Catholique de Louvain, 1348 Louvain-la-Neuve (Belgium); Raskin, J. P.; Gil, E. C. [Institut de Recherche en Mathematique et Physique IRMP, Universite Catholique de Louvain, 1348 Louvain-la-Neuve (Belgium); Flandre, D. [Inst. of Information and Communication Technologies, Electronics and Applied Mathematics ICTEAM, Universite Catholique de Louvain, 1348 Louvain-la-Neuve (Belgium)

    2011-07-01

    Hadron-therapy has gained increasing interest for cancer treatment especially within the last decade. System commissioning and quality assurance procedures impose to monitor the particle beam using 2D dose measurements. Nowadays, several monitoring systems exist for hadron-therapy but all show a relatively high influence on the beam properties: indeed, most devices consist of several layers of materials that degrade the beam through scattering and energy losses. For precise treatment purposes, ultra-thin silicon strip detectors are investigated in order to reduce this beam scattering. We assess the beam size increase provoked by the Multiple Coulomb Scattering when passing through Si, to derive a target thickness. Monte-Carlo based simulations show a characteristic scattering opening angle lower than 1 mrad for thicknesses below 20 {mu}m. We then evaluated the fabrication process feasibility. We successfully thinned down silicon wafers to thicknesses lower than 10 {mu}m over areas of several cm{sup 2}. Strip detectors are presently being processed and they will tentatively be thinned down to 20 {mu}m. Moreover, two-dimensional TCAD simulations were carried out to investigate the beam detector performances on p-type Si substrates. Additionally, thick and thin substrates have been compared thanks to electrical simulations. Reducing the pitch between the strips increases breakdown voltage, whereas leakage current is quite insensitive to strips geometrical configuration. The samples are to be characterized as soon as possible in one of the IBA hadron-therapy facilities. For hadron-therapy, this would represent a considerable step forward in terms of treatment precision. (authors)

  4. Continuous Czochralski growth: Silicon sheet growth development of the large area silicon sheet task of the Low Cost Silicon Solar Array project

    Science.gov (United States)

    1978-01-01

    The primary objective of this contract is to develop equipment and methods for the economic production of single crystal ingot material by the continuous Czochralski (CZ) process. Continuous CZ is defined for the purpose of this work as the growth of at least 100 kilograms of ingot from only one melt container. During the reporting period (October, 1977 - September, 1978), a modified grower was made fully functional and several recharge runs were performed. The largest run lasted 44 hours and over 42 kg of ingot was produced. Little, if any, degradation in efficiency was observed as a result of pulling multiple crystals from one crucible. Solar efficiencies observed were between 9.3 and 10.4% AMO (13.0 and 14.6% AMI) compared to 10.5% (14.7% AMI) for optimum CZ material control samples. Using the SAMICS/IPEG format, economic analysis of continuous CZ suggests that 1986 DoE cost goals can only be met by the growth of large diameter, large mass crystals.

  5. Study of nanoparticles TiO2 thin films on p-type silicon substrate using different alcoholic solvents

    Science.gov (United States)

    Muaz, A. K. M.; Hashim, U.; Arshad, M. K. Md.; Ruslinda, A. R.; Ayub, R. M.; Gopinath, Subash C. B.; Voon, C. H.; Liu, Wei-Wen; Foo, K. L.

    2016-07-01

    In this paper, sol-gel method spin coating technique is adopted to prepare nanoparticles titanium dioxide (TiO2) thin films. The prepared TiO2 sol was synthesized using titanium butoxide act as a precursor and subjected to deposited on the p-type silicon oxide (p-SiO2) and glass slide substrates under room temperature. The effect of different alcoholic solvents of methanol and ethanol on the structural, morphological, optical and electrical properties were systematically investigated. The coated TiO2 thin films were annealed in furnace at 773 K for 1 h. The structural properties of the TiO2 films were examined with X-ray Diffraction (XRD). From the XRD analysis, both solvents showing good crystallinity with anatase phase were the predominant structure. Atomic Force Microscopy (AFM) was employed to study the morphological of the thin films. The optical properties were investigated by Ultraviolet-visible (UV-Vis) spectroscopy were found that ethanol as a solvent give a higher optical transmittance if compare to the methanol solvent. The electrical properties of the nanoparticles TiO2 thin films were measured using two-point-probe technique.

  6. Optical and Electrical Effects of p-type μc-SiOx:H in Thin-Film Silicon Solar Cells on Various Front Textures

    Directory of Open Access Journals (Sweden)

    Chao Zhang

    2014-01-01

    Full Text Available p-type hydrogenated microcrystalline silicon oxide (µc-SiOx:H was developed and implemented as a contact layer in hydrogenated amorphous silicon (a-Si:H single junction solar cells. Higher transparency, sufficient electrical conductivity, low ohmic contact to sputtered ZnO:Al, and tunable refractive index make p-type µc-SiOx:H a promising alternative to the commonly used p-type hydrogenated microcrystalline silicon (µc-Si:H contact layers. In this work, p-type µc-SiOx:H layers were fabricated with a conductivity of up to 10−2 S/cm and a Raman crystallinity of above 60%. Furthermore, we present p-type µc-SiOx:H films with a broad range of optical properties (2.1 eV < band gap E04<2.8 eV and 1.6 < refractive index n<2.6. These properties can be tuned by adapting deposition parameters, for example, the CO2/SiH4 deposition gas ratio. A conversion efficiency improvement of a-Si:H solar cells is achieved by applying p-type µc-SiOx:H contact layer compared to the standard p-type µc-Si:H contact layer. As another aspect, the influence of the front side texture on a-Si:H p-i-n solar cells with different p-type contact layers, µc-Si:H and µc-SiOx:H, is investigated. Furthermore, we discuss the correlation between the decrease of Voc and the cell surface area derived from AFM measurements.

  7. a-Si:H/c-Si heterojunction front- and back contacts for silicon solar cells with p-type base

    Energy Technology Data Exchange (ETDEWEB)

    Rostan, Philipp Johannes

    2010-07-01

    This thesis reports on low temperature amorphous silicon back and front contacts for high-efficiency crystalline silicon solar cells with a p-type base. The back contact uses a sequence of intrinsic amorphous (i-a-Si:H) and boron doped microcrystalline (p-{mu}c-Si:H) silicon layers fabricated by Plasma Enhanced Chemical Vapor Deposition (PECVD) and a magnetron sputtered ZnO:Al layer. The back contact is finished by evaporating Al onto the ZnO:Al and altogether prepared at a maximum temperature of 220 C. Analysis of the electronic transport of mobile charge carriers at the back contact shows that the two high-efficiency requirements low back contact series resistance and high quality c-Si surface passivation are in strong contradiction to each other, thus difficult to achieve at the same time. The preparation of resistance- and effective lifetime samples allows one to investigate both requirements independently. Analysis of the majority charge carrier transport on complete Al/ZnO:Al/a-Si:H/c-Si back contact structures derives the resistive properties. Measurements of the effective minority carrier lifetime on a-Si:H coated wafers determines the back contact surface passivation quality. Both high-efficiency solar cell requirements together are analyzed in complete photovoltaic devices where the back contact series resistance mainly affects the fill factor and the back contact passivation quality mainly affects the open circuit voltage. The best cell equipped with a diffused emitter with random texture and a full-area a-Si:H/c-Si back contact has an independently confirmed efficiency {eta} = 21.0 % with an open circuit voltage V{sub oc} = 681 mV and a fill factor FF = 78.7 % on an area of 1 cm{sup 2}. An alternative concept that uses a simplified a-Si:H layer sequence combined with Al-point contacts yields a confirmed efficiency {eta} = 19.3 % with an open circuit voltage V{sub oc} = 655 mV and a fill factor FF = 79.5 % on an area of 2 cm{sup 2}. Analysis of the

  8. a-Si:H/c-Si heterojunction front- and back contacts for silicon solar cells with p-type base

    Energy Technology Data Exchange (ETDEWEB)

    Rostan, Philipp Johannes

    2010-07-01

    This thesis reports on low temperature amorphous silicon back and front contacts for high-efficiency crystalline silicon solar cells with a p-type base. The back contact uses a sequence of intrinsic amorphous (i-a-Si:H) and boron doped microcrystalline (p-{mu}c-Si:H) silicon layers fabricated by Plasma Enhanced Chemical Vapor Deposition (PECVD) and a magnetron sputtered ZnO:Al layer. The back contact is finished by evaporating Al onto the ZnO:Al and altogether prepared at a maximum temperature of 220 C. Analysis of the electronic transport of mobile charge carriers at the back contact shows that the two high-efficiency requirements low back contact series resistance and high quality c-Si surface passivation are in strong contradiction to each other, thus difficult to achieve at the same time. The preparation of resistance- and effective lifetime samples allows one to investigate both requirements independently. Analysis of the majority charge carrier transport on complete Al/ZnO:Al/a-Si:H/c-Si back contact structures derives the resistive properties. Measurements of the effective minority carrier lifetime on a-Si:H coated wafers determines the back contact surface passivation quality. Both high-efficiency solar cell requirements together are analyzed in complete photovoltaic devices where the back contact series resistance mainly affects the fill factor and the back contact passivation quality mainly affects the open circuit voltage. The best cell equipped with a diffused emitter with random texture and a full-area a-Si:H/c-Si back contact has an independently confirmed efficiency {eta} = 21.0 % with an open circuit voltage V{sub oc} = 681 mV and a fill factor FF = 78.7 % on an area of 1 cm{sup 2}. An alternative concept that uses a simplified a-Si:H layer sequence combined with Al-point contacts yields a confirmed efficiency {eta} = 19.3 % with an open circuit voltage V{sub oc} = 655 mV and a fill factor FF = 79.5 % on an area of 2 cm{sup 2}. Analysis of the

  9. Development of advanced methods for continuous Czochralski growth. Silicon sheet growth development for the large area silicon sheet task of the low cost silicon solar array project

    Science.gov (United States)

    Wolfson, R. G.; Sibley, C. B.

    1978-01-01

    The three components required to modify the furnace for batch and continuous recharging with granular silicon were designed. The feasibility of extended growth cycles up to 40 hours long was demonstrated by a recharge simulation experiment; a 6 inch diameter crystal was pulled from a 20 kg charge, remelted, and pulled again for a total of four growth cycles, 59-1/8 inch of body length, and approximately 65 kg of calculated mass.

  10. High-field EPR spectroscopy of thermal donors in silicon

    DEFF Research Database (Denmark)

    Dirksen, R.; Rasmussen, F.B.; Gregorkiewicz, T.

    1997-01-01

    Thermal donors generated in p-type boron-doped Czochralski-grown silicon by a 450 degrees C heat treatment have been studied by high-field magnetic resonance spectroscopy. In the experiments conducted at a microwave frequency of 140 GHz and in a magnetic field of approximately 5 T four individual...

  11. XANES and IR spectroscopy study of the electronic structure and chemical composition of porous silicon on n- and p-type substrates

    Energy Technology Data Exchange (ETDEWEB)

    Lenshin, A. S., E-mail: lenshinas@phys.vsu.ru; Kashkarov, V. M.; Seredin, P. V. [Voronezh State University (Russian Federation); Spivak, Yu. M.; Moshnikov, V. A. [LETI St. Petersburg State Electrotechnical University (Russian Federation)

    2011-09-15

    The differences in the electronic structure and composition of porous silicon samples obtained under identical conditions of electrochemical etching on the most commonly used n- and p-type substrates with different conductivities are demonstrated by X-ray absorption near-edge spectroscopy (XANES) and Fourier transform IR spectroscopy (FTIR) methods. It is shown that significantly higher oxidation and saturation with hydrogen is observed for the porous layer on n-type substrates.

  12. Study of an Amorphous Silicon Oxide Buffer Layer for p-Type Microcrystalline Silicon Oxide/n-Type Crystalline Silicon Heterojunction Solar Cells and Their Temperature Dependence

    Directory of Open Access Journals (Sweden)

    Taweewat Krajangsang

    2014-01-01

    Full Text Available Intrinsic hydrogenated amorphous silicon oxide (i-a-SiO:H films were used as front and rear buffer layers in crystalline silicon heterojunction (c-Si-HJ solar cells. The surface passivity and effective lifetime of these i-a-SiO:H films on an n-type silicon wafer were improved by increasing the CO2/SiH4 ratios in the films. Using i-a-SiO:H as the front and rear buffer layers in c-Si-HJ solar cells was investigated. The front i-a-SiO:H buffer layer thickness and the CO2/SiH4 ratio influenced the open-circuit voltage (Voc, fill factor (FF, and temperature coefficient (TC of the c-Si-HJ solar cells. The highest total area efficiency obtained was 18.5% (Voc=700 mV, Jsc=33.5 mA/cm2, and FF=0.79. The TC normalized for this c-Si-HJ solar cell efficiency was −0.301%/°C.

  13. Iron-boron pairing kinetics in illuminated p-type and in boron/phosphorus co-doped n-type silicon

    Energy Technology Data Exchange (ETDEWEB)

    Möller, Christian, E-mail: cmoeller@cismst.de [CiS Forschungsinstitut für Mikrosensorik und Photovoltaik GmbH, Konrad-Zuse-Str. 14, 99099 Erfurt (Germany); TU Ilmenau, Institut für Physik, Weimarer Str. 32, 98693 Ilmenau (Germany); Bartel, Til; Gibaja, Fabien [Calisolar GmbH, Magnusstraße 11, 12489 Berlin (Germany); Lauer, Kevin [CiS Forschungsinstitut für Mikrosensorik und Photovoltaik GmbH, Konrad-Zuse-Str. 14, 99099 Erfurt (Germany)

    2014-07-14

    Iron-boron (FeB) pairing is observed in the n-type region of a boron and phosphorus co-doped silicon sample which is unexpected from the FeB pair model of Kimerling and Benton. To explain the experimental data, the existing FeB pair model is extended by taking into account the electronic capture and emission rates at the interstitial iron (Fe{sub i}) trap level as a function of the charge carrier densities. According to this model, the charge state of the Fe{sub i} may be charged in n-type making FeB association possible. Further, FeB pair formation during illumination in p-type silicon is investigated. This permits the determination of the charge carrier density dependent FeB dissociation rate and in consequence allows to determine the acceptor concentration in the co-doped n-type silicon by lifetime measurement.

  14. P-stop isolation study of irradiated n-in-p type silicon strip sensors for harsh radiation environments

    Science.gov (United States)

    Printz, Martin

    2016-09-01

    In order to determine the most radiation hard silicon sensors for the CMS Experiment after the Phase II Upgrade in 2023 a comprehensive study of silicon sensors after a fluence of up to 1.5 ×1015neq /cm2 corresponding to 3000fb-1 after the HL-LHC era has been carried out. The results led to the decision that the future Outer Tracker (20 cm MIPs penetrating the sensor between two strips.

  15. Recycling of p-type mc-si Top Cuts into p-type mono c-Si Solar Cells

    Energy Technology Data Exchange (ETDEWEB)

    Bronsveld, P.C.P.; Manshanden, P.; Lenzmann, F.O. [ECN Solar Energy, Westerduinweg 3, P.O. Box 1, NL-1755 ZG Petten (Netherlands); Gjerstad, O. [Si Pro Holding AS, Ornesveien 3, P.O. Box 37, 8161, Glomfjord (Norway); Oevrelid, E.J. [SINTEF, Alfred Getz Vei 2, 7465, Trondheim (Norway)

    2013-07-01

    Solar cell results and material analysis are presented of 2 p-type Czochralski (Cz) ingots pulled from a charge consisting of 100% and 50% recycled multicrystalline silicon top cuts. The top cuts were pre-cleaned with a dedicated low energy consuming technology. No structure loss was observed in the bodies of the ingots. The performance of solar cells made from the 100% recycled Si ingot decreases towards the seed end of the ingot, which could be related to a non-optimal pulling process. Solar cells from the tail end of this ingot and from the 50% recycled Si ingot demonstrated an average solar cell efficiency of 18.6%. This is only 0.1% absolute lower than the efficiency of higher resistivity reference solar cells from commercially available wafers that were co-processed.

  16. Comparison between rad-hard standard float zone (FZ) and magnetic Czochralski (MCZ) silicon diodes in radiotherapy electron beam dosimetry

    Energy Technology Data Exchange (ETDEWEB)

    Santos, T.C. dos; Goncalves, J.A.C.; Vasques, M.M.; Tobias, C.C.B. [Instituto de Pesquisas Energeticas e Nucleares (IPEN/CNEN-SP), Sao Paulo, SP (Brazil). Centro de Tecnologia das Radiacoes; Neves-Junior, W.F.P.; Haddad, C.M.K. [Hospital Sirio Libanes, Sao Paulo, SP (Brazil). Sociedade Beneficente de Senhoras; Harkonen, J. [Helsinki University of Technology (Denmark). Helsinki Inst. of Physics

    2010-07-01

    Full text. The use of semiconductor detectors has increased in radiotherapy practice since 1980s due to mainly their fast processing time, small sensitive volume and high relative sensitivity to ionizing radiation. Other major advantages of Si devices are excellent repeatability, good mechanical stability, high spatial resolution and the energy independence of mass collision stopping powers ratios (between silicon and water for electron beams with energy from 4 up to 20 MeV). However, ordinary silicon devices are very prone to radiation damage effects. In the last years, the development of radiation tolerant silicon detectors for High Energy Physics experiments has overcome this drawback. In this work we present the preliminary results obtained with a rad-hard epitaxial silicon diode as on-line clinical electron beam dosimeter. The diodes with 25 mm{sup 2} active area, were housed in a PMMA probe and connected, in a photovoltaic mode, to a Keithley 6517B electrometer. During all measurements, the diodes were held between PMMA plates, placed at Zref and centered in a radiation field of 10 cm x 10 cm, with the SSD kept at 100 cm. The devices dosimetric response was evaluated for 6, 9, 12, 15, 18 e 21 MeV electron beams from a Siemens KD 2 Radiotherapy Linear Accelerator, located at Sirio-Libanes Hospital. The radiation induced current in the diodes was registered as a function of the exposure time during 60 s for a fixed 300 MU. To study the short term repeatability, current signals were registered for the same radiation dose, for all energies. The dose-response of the diodes was achieved through the integration of the current signals as a function of the exposure time. The results obtained in the energy range of 6 up to 21 MeV evidenced that, for the same average dose rate of 5.0 cGy/s, the current signals are very stable and repeatable in both cases. For all energies, data shows good instantaneous repeatability with a percentage variation coefficient better than 2

  17. Superparamagnetic iron oxide nanoparticle attachment on array of micro test tubes and microbeakers formed on p-type silicon substrate for biosensor applications

    Science.gov (United States)

    Ghoshal, Sarmishtha; Ansar, Abul Am; Raja, Sufi O.; Jana, Arpita; Bandyopadhyay, Nil R.; Dasgupta, Anjan K.; Ray, Mallar

    2011-10-01

    A uniformly distributed array of micro test tubes and microbeakers is formed on a p-type silicon substrate with tunable cross-section and distance of separation by anodic etching of the silicon wafer in N, N-dimethylformamide and hydrofluoric acid, which essentially leads to the formation of macroporous silicon templates. A reasonable control over the dimensions of the structures could be achieved by tailoring the formation parameters, primarily the wafer resistivity. For a micro test tube, the cross-section (i.e., the pore size) as well as the distance of separation between two adjacent test tubes (i.e., inter-pore distance) is typically approximately 1 μm, whereas, for a microbeaker the pore size exceeds 1.5 μm and the inter-pore distance could be less than 100 nm. We successfully synthesized superparamagnetic iron oxide nanoparticles (SPIONs), with average particle size approximately 20 nm and attached them on the porous silicon chip surface as well as on the pore walls. Such SPION-coated arrays of micro test tubes and microbeakers are potential candidates for biosensors because of the biocompatibility of both silicon and SPIONs. As acquisition of data via microarray is an essential attribute of high throughput bio-sensing, the proposed nanostructured array may be a promising step in this direction.

  18. Superparamagnetic iron oxide nanoparticle attachment on array of micro test tubes and microbeakers formed on p-type silicon substrate for biosensor applications

    Directory of Open Access Journals (Sweden)

    Raja Sufi

    2011-01-01

    Full Text Available Abstract A uniformly distributed array of micro test tubes and microbeakers is formed on a p-type silicon substrate with tunable cross-section and distance of separation by anodic etching of the silicon wafer in N, N-dimethylformamide and hydrofluoric acid, which essentially leads to the formation of macroporous silicon templates. A reasonable control over the dimensions of the structures could be achieved by tailoring the formation parameters, primarily the wafer resistivity. For a micro test tube, the cross-section (i.e., the pore size as well as the distance of separation between two adjacent test tubes (i.e., inter-pore distance is typically approximately 1 μm, whereas, for a microbeaker the pore size exceeds 1.5 μm and the inter-pore distance could be less than 100 nm. We successfully synthesized superparamagnetic iron oxide nanoparticles (SPIONs, with average particle size approximately 20 nm and attached them on the porous silicon chip surface as well as on the pore walls. Such SPION-coated arrays of micro test tubes and microbeakers are potential candidates for biosensors because of the biocompatibility of both silicon and SPIONs. As acquisition of data via microarray is an essential attribute of high throughput bio-sensing, the proposed nanostructured array may be a promising step in this direction.

  19. Interface modification effect between p-type a-SiC:H and ZnO:Al in p-i-n amorphous silicon solar cells.

    Science.gov (United States)

    Baek, Seungsin; Lee, Jeong Chul; Lee, Youn-Jung; Iftiquar, Sk Md; Kim, Youngkuk; Park, Jinjoo; Yi, Junsin

    2012-01-18

    Aluminum-doped zinc oxide (ZnO:Al) [AZO] is a good candidate to be used as a transparent conducting oxide [TCO]. For solar cells having a hydrogenated amorphous silicon carbide [a-SiC:H] or hydrogenated amorphous silicon [a-Si:H] window layer, the use of the AZO as TCO results in a deterioration of fill factor [FF], so fluorine-doped tin oxide (Sn02:F) [FTO] is usually preferred as a TCO. In this study, interface engineering is carried out at the AZO and p-type a-SiC:H interface to obtain a better solar cell performance without loss in the FF. The abrupt potential barrier at the interface of AZO and p-type a-SiC:H is made gradual by inserting a buffer layer. A few-nanometer-thick nanocrystalline silicon buffer layer between the AZO and a-SiC:H enhances the FF from 67% to 73% and the efficiency from 7.30% to 8.18%. Further improvements in the solar cell performance are expected through optimization of cell structures and doping levels.

  20. Gas doping ratio effects on p-type hydrogenated nanocrystalline silicon thin films grown by hot-wire chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Luo, P.Q. [Solar Energy Institute, Department of Physics, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240 (China)], E-mail: robt@sjtu.edu.cn; Zhou, Z.B. [Solar Energy Institute, Department of Physics, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240 (China)], E-mail: zbzhou@sjtu.edu.cn; Chan, K.Y. [Thin Film Laboratory, Faculty of Engineering, Multimedia University, Jalan Multimedia, Cyberjaya 63100, Selangor (Malaysia); Tang, D.Y.; Cui, R.Q.; Dou, X.M. [Solar Energy Institute, Department of Physics, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240 (China)

    2008-12-30

    Hydrogenated nanocrystalline silicon (nc-Si:H) grown by hot-wire chemical vapor deposition (HWCVD) has recently drawn significant attention in the area of thin-film large area optoelectronics due to possibility of high deposition rate. We report on the effects of diborane (B{sub 2}H{sub 6}) doping ratio on the microstructural and optoelectrical properties of the p-type nc-Si:H thin films grown by HWCVD at low substrate temperature of 200 deg. C and with high hydrogen dilution ratio of 98.8%. An attempt has been made to elucidate the boron doping mechanism of the p-type nc-Si:H thin films deposited by HWCVD and the correlation between the B{sub 2}H{sub 6} doping ratio, crystalline volume fraction, optical band gap and dark conductivity.

  1. Continuous Czochralski growth: Silicon sheet growth development of the large area sheet task of the low cost silicon solar array project

    Science.gov (United States)

    Johnson, C. M.

    1980-01-01

    The growth of 100 kg of silicon single crystal material, ten cm in diameter or greater, and 150 kg of silicon single crystal material 15 cm or greater utilizing one common silicon container material (one crucible) is investigated. A crystal grower that is recharged with a new supply of polysilicon material while still under vacuum and at temperatures above the melting point of silicon is developed. It accepts large polysilicon charges up to 30 kg, grows large crystal ingots (to 15 cm diameter and 25 kg in weight), and holds polysilicon material for recharging (rod or lump) while, at the same time, growing crystal ingots. Special equipment is designed to recharge polysilicon rods, recharge polysilicon lumps, and handle and store large, hot silicon crystal ingots. Many continuous crystal growth runs were performed lasting as long as 109 hours and producing as many as ten crystal ingots, 15 cm with weights progressing to 27 kg.

  2. Development of Edgeless Silicon Pixel Sensors on p-type substrate for the ATLAS High-Luminosity Upgrade

    Energy Technology Data Exchange (ETDEWEB)

    Calderini, G. [Laboratoire de Physique Nucléaire et des Hautes Energies (LPNHE), Paris (France); Dipartimento di Fisica E. Fermi, Universitá di Pisa, Pisa (Italy); Bagolini, A. [Fondazione Bruno Kessler, Centro per i Materiali e i Microsistemi (FBK-CMM), Povo di Trento (Italy); Beccherle, R. [Istituto Nazionale di Fisica Nucleare, Sez. di Pisa (Italy); Bomben, M. [Laboratoire de Physique Nucléaire et des Hautes Energies (LPNHE), Paris (France); Boscardin, M. [Fondazione Bruno Kessler, Centro per i Materiali e i Microsistemi (FBK-CMM), Povo di Trento (Italy); Bosisio, L. [Università degli studi di Trieste (Italy); INFN-Trieste (Italy); Chauveau, J. [Laboratoire de Physique Nucléaire et des Hautes Energies (LPNHE), Paris (France); Giacomini, G. [Fondazione Bruno Kessler, Centro per i Materiali e i Microsistemi (FBK-CMM), Povo di Trento (Italy); La Rosa, A. [Section de Physique (DPNC), Universitè de Geneve, Geneve (Switzerland); Marchiori, G. [Laboratoire de Physique Nucléaire et des Hautes Energies (LPNHE), Paris (France); Zorzi, N. [Fondazione Bruno Kessler, Centro per i Materiali e i Microsistemi (FBK-CMM), Povo di Trento (Italy)

    2016-09-21

    In view of the LHC upgrade phases towards the High Luminosity LHC (HL-LHC), the ATLAS experiment plans to upgrade the Inner Detector with an all-silicon system. The n-on-p silicon technology is a promising candidate to achieve a large area instrumented with pixel sensors, since it is radiation hard and cost effective. The presentation describes the performance of novel n-in-p edgeless planar pixel sensors produced by FBK-CMM, making use of the active trench for the reduction of the dead area at the periphery of the device. After discussing the sensor technology, some feedback from preliminary results of the first beam test will be discussed.

  3. Development of Edgeless Silicon Pixel Sensors on p-type substrate for the ATLAS High-Luminosity Upgrade

    Science.gov (United States)

    Calderini, G.; Bagolini, A.; Beccherle, R.; Bomben, M.; Boscardin, M.; Bosisio, L.; Chauveau, J.; Giacomini, G.; La Rosa, A.; Marchiori, G.; Zorzi, N.

    2016-09-01

    In view of the LHC upgrade phases towards the High Luminosity LHC (HL-LHC), the ATLAS experiment plans to upgrade the Inner Detector with an all-silicon system. The n-on-p silicon technology is a promising candidate to achieve a large area instrumented with pixel sensors, since it is radiation hard and cost effective. The presentation describes the performance of novel n-in-p edgeless planar pixel sensors produced by FBK-CMM, making use of the active trench for the reduction of the dead area at the periphery of the device. After discussing the sensor technology, some feedback from preliminary results of the first beam test will be discussed.

  4. Performance of Edgeless Silicon Pixel Sensors on p-type substrate for the ATLAS High-Luminosity Upgrade

    CERN Document Server

    INSPIRE-00052711; Boscardin, Maurizio; Bosisio, Luciano; Calderini, Giovanni; Chauveau, Jacques; Ducourthial, Audrey; Giacomini, Gabriele; Marchiori, Giovanni; Zorzi, Nicola

    2016-01-01

    In view of the LHC upgrade phases towards the High Luminosity LHC (HL-LHC), the ATLAS experiment plans to upgrade the Inner Detector with an all-silicon system. The n-on-p silicon technology is a promising candidate to achieve a large area instrumented with pixel sensors, since it is radiation hard and cost effective. The paper reports on the performance of novel n-on-p edgeless planar pixel sensors produced by FBK-CMM, making use of the active trench for the reduction of the dead area at the periphery of the device. After discussing the sensor technology an overview of the first beam test results will be given.

  5. Photoelectron yield spectroscopy and inverse photoemission spectroscopy evaluations of p-type amorphous silicon carbide films prepared using liquid materials

    Energy Technology Data Exchange (ETDEWEB)

    Murakami, Tatsuya, E-mail: mtatsuya@jaist.ac.jp, E-mail: mtakashi@jaist.ac.jp [Center for Nano Materials and Technology, Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292 (Japan); Masuda, Takashi, E-mail: mtatsuya@jaist.ac.jp, E-mail: mtakashi@jaist.ac.jp; Inoue, Satoshi; Shimoda, Tatsuya [Green Device Research Center, Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1211 (Japan); Yano, Hiroshi; Iwamuro, Noriyuki [Graduate School of Pure and Applied Sciences, University of Tsukuba, Tennoudai, Tsukuba, Ibaraki 305-8573 (Japan)

    2016-05-15

    Phosphorus-doped amorphous silicon carbide films were prepared using a polymeric precursor solution. Unlike conventional polymeric precursors, this polymer requires neither catalysts nor oxidation for its synthesis and cross-linkage, providing semiconducting properties in the films. The valence and conduction states of resultant films were determined directly through the combination of inverse photoemission spectroscopy and photoelectron yield spectroscopy. The incorporated carbon widened energy gap and optical gap comparably in the films with lower carbon concentrations. In contrast, a large deviation between the energy gap and the optical gap was observed at higher carbon contents because of exponential widening of the band tail.

  6. Design and analysis of nanowire p-type MOSFET coaxially having silicon core and germanium peripheral channel

    Science.gov (United States)

    Yu, Eunseon; Cho, Seongjae

    2016-11-01

    In this work, a nanowire p-type metal-oxide-semiconductor field-effect transistor (PMOSFET) coaxially having a Si core and a Ge peripheral channel is designed and characterized by device simulations. Owing to the high hole mobility of Ge, the device can be utilized for high-speed CMOS integrated circuits, with the effective confinement of mobile holes in Ge by the large valence band offset between Si and Ge. Source/drain doping concentrations and the ratio between the Si core and Ge channel thicknesses are determined. On the basis of the design results, the channel length is aggressively scaled down by evaluating the primary DC parameters in order to confirm device scalability and low-power applicability in sub-10-nm technology nodes.

  7. Electrical properties and surface morphology of electron beam evaporated p-type silicon thin films on polyethylene terephthalate for solar cells applications

    Energy Technology Data Exchange (ETDEWEB)

    Ang, P. C.; Ibrahim, K.; Pakhuruddin, M. Z. [Nano-Optoelectronics Research and Technology Laboratory, School of Physics, Universiti Sains Malaysia, Minden 11800 Penang (Malaysia)

    2015-04-24

    One way to realize low-cost thin film silicon (Si) solar cells fabrication is by depositing the films with high-deposition rate and manufacturing-compatible electron beam (e-beam) evaporation onto inexpensive foreign substrates such as glass or plastic. Most of the ongoing research is reported on e-beam evaporation of Si films on glass substrates to make polycrystalline solar cells but works combining both e-beam evaporation and plastic substrates are still scarce in the literature. This paper studies electrical properties and surface morphology of 1 µm electron beam evaporated Al-doped p-type silicon thin films on textured polyethylene terephthalate (PET) substrate for application as an absorber layer in solar cells. In this work, Si thin films with different doping concentrations (including an undoped reference) are prepared by e-beam evaporation. Energy dispersion X-ray (EDX) showed that the Si films are uniformly doped by Al dopant atoms. With increased Al/Si ratio, doping concentration increased while both resistivity and carrier mobility of the films showed opposite relationships. Root mean square (RMS) surface roughness increased. Overall, the Al-doped Si film with Al/Si ratio of 2% (doping concentration = 1.57×10{sup 16} atoms/cm{sup 3}) has been found to provide the optimum properties of a p-type absorber layer for fabrication of thin film Si solar cells on PET substrate.

  8. Study the Characteristic of P-Type Junction-Less Side Gate Silicon Nanowire Transistor Fabricated by Atomic Force Microscopy Lithography

    Directory of Open Access Journals (Sweden)

    Arash Dehzangi

    2011-01-01

    Full Text Available Problem statement: Nanotransistor now is one of the most promising fields in nanoelectronics in order to decrease the energy consuming and application to create developed programmable information processors. Most of Computing and communications companies invest hundreds of millions of dollars in research funds every year to develop smaller transistors. Approach: The Junction-less side gate silicon Nano-wire transistor has been fabricated by Atomic Force Microscopy (AFM and wet etching on p-type Silicon On Insulator (SOI wafer. Then, we checked the characteristic and conductance trend in this device regarding to semi-classical approach by Semiconductor Probe Analyser (SPA. Results: We observed in characteristic of the device directly proportionality of the negative gate voltage and Source-Drain current. In semi classical approach, negative Gate voltage decreased the energy States of the Nano-wire between the source and the drain. The graph for positive gate voltage plotted as well to check. In other hand, the conductance will be following characteristic due to varying the gate voltage under the different drain-source voltage. Conclusion: The channel energy states are supposed to locate between two electrochemical potentials of the contacts in order to transform the charge. For the p-type channel the transform of the carriers is located in valence band and changing the positive or negative gate voltage, making the valence band energy states out of or in the area between the electrochemical potentials of the contacts causing the current reduced or increased.

  9. Direct ultrasensitive electrical detection of prostate cancer biomarkers with CMOS-compatible n- and p-type silicon nanowire sensor arrays

    Science.gov (United States)

    Gao, Anran; Lu, Na; Dai, Pengfei; Fan, Chunhai; Wang, Yuelin; Li, Tie

    2014-10-01

    Sensitive and quantitative analysis of proteins is central to disease diagnosis, drug screening, and proteomic studies. Here, a label-free, real-time, simultaneous and ultrasensitive prostate-specific antigen (PSA) sensor was developed using CMOS-compatible silicon nanowire field effect transistors (SiNW FET). Highly responsive n- and p-type SiNW arrays were fabricated and integrated on a single chip with a complementary metal oxide semiconductor (CMOS) compatible anisotropic self-stop etching technique which eliminated the need for a hybrid method. The incorporated n- and p-type nanowires revealed complementary electrical response upon PSA binding, providing a unique means of internal control for sensing signal verification. The highly selective, simultaneous and multiplexed detection of PSA marker at attomolar concentrations, a level useful for clinical diagnosis of prostate cancer, was demonstrated. The detection ability was corroborated to be effective by comparing the detection results at different pH values. Furthermore, the real-time measurement was also carried out in a clinically relevant sample of blood serum, indicating the practicable development of rapid, robust, high-performance, and low-cost diagnostic systems.Sensitive and quantitative analysis of proteins is central to disease diagnosis, drug screening, and proteomic studies. Here, a label-free, real-time, simultaneous and ultrasensitive prostate-specific antigen (PSA) sensor was developed using CMOS-compatible silicon nanowire field effect transistors (SiNW FET). Highly responsive n- and p-type SiNW arrays were fabricated and integrated on a single chip with a complementary metal oxide semiconductor (CMOS) compatible anisotropic self-stop etching technique which eliminated the need for a hybrid method. The incorporated n- and p-type nanowires revealed complementary electrical response upon PSA binding, providing a unique means of internal control for sensing signal verification. The highly

  10. Development of Edgeless Silicon Pixel Sensors on p-type substrate for the ATLAS High-Luminosity Upgrade

    CERN Document Server

    Calderini, G; Bomben, M; Boscardin, M; Bosisio, L; Chauveau, J; Giacomini, G; La Rosa, A; Marchiori, G; Zorzi, N

    2014-01-01

    In view of the LHC upgrade for the high luminosity phase (HL-LHC), the ATLAS experiment is planning to replace the inner detector with an all-silicon system. The n-in-p bulk technology represents a valid solution for the modules of most of the layers, given the significant radiation hardness of this option and the reduced cost. The large area necessary to instrument the outer layers will demand to tile the sensors, a solution for which the inefficient region at the border of each sensor needs to be reduced to the minimum size. This paper reports on a joint R&D project by the ATLAS LPNHE Paris group and FBK Trento on a novel n-in-p edgeless planar pixel design, based on the deep-trench process available at FBK.

  11. Characterization of stain etched p-type silicon in aqueous HF solutions containing HNO{sub 3} or KMnO{sub 4}

    Energy Technology Data Exchange (ETDEWEB)

    Mogoda, A.S., E-mail: awad_mogoda@hotmail.com [Department of Chemistry, Faculty of Science, Cairo University, Giza (Egypt); Ahmad, Y.H.; Badawy, W.A. [Department of Chemistry, Faculty of Science, Cairo University, Giza (Egypt)

    2011-04-15

    Research highlights: {yields} Stain etching of p-Si in aqueous HF solutions containing HNO{sub 3} or KMnO{sub 4} was investigated. {yields} The electrical conductivity of the etched Si surfaces was measured using impedance technique. {yields} Scanning electron microscope and energy disperse X-ray were used to analyze the etched surfaces. {yields} Etching in aqueous HF solution containing HNO{sub 3} led to formation of a porous silicon layer. {yields} The formation of the porous silicon layer in HF/KMnO{sub 4} was accompanied by deposition of K{sub 2}SiF{sub 6} on the pores surfaces. - Abstract: Stain etching of p-type silicon in hydrofluoric acid solutions containing nitric acid or potassium permanganate as an oxidizing agent has been examined. The effects of etching time, oxidizing agent and HF concentrations on the electrochemical behavior of etched silicon surfaces have been investigated by electrochemical impedance spectroscopy (EIS). An electrical equivalent circuit was used for fitting the impedance data. The morphology and the chemical composition of the etched Si surface were studied using scanning electron microscopy (SEM) and energy dispersive X-ray (EDX) techniques, respectively. A porous silicon layer was formed on Si etched in HF solutions containing HNO{sub 3}, while etching in HF solutions containing KMnO{sub 4} led to the formation of a porous layer and simultaneous deposition of K{sub 2}SiF{sub 6} inside the pores. The thickness of K{sub 2}SiF{sub 6} layer increases with increasing the KMnO{sub 4} concentration and decreases as the concentration of HF increases.

  12. The electrical properties of photodiodes based on nanostructure gallium doped cadmium oxide/p-type silicon junctions

    Science.gov (United States)

    Çavaş, M.; Yakuphanoğlu, F.; Karataş, Ş.

    2017-01-01

    Gallium doped cadmium-oxide (CdO: Ga) thin films were successfully deposited by sol-gel spin coating method on p-type Si substrate. The electrical properties of the photodiode based on nanostructure Ga doped n-CdO/p-Si junctions were investigated. The current-voltage (I-V) characteristics of the structure were investigated under various light intensity and dark. It was observed that generated photocurrent of the Au/n-CdO/p-Si junctions depended on light intensity. The capacitance-voltage and conductance-voltage measurements were carried out for this diode in the frequency range between 100 and 1000 kHz at room temperature by steps of 100 kHz. The capacitance decreased with increasing frequency due to a continuous distribution of the interface states. These results suggested that the Au/n-CdO/p-Si Schottky junctions could be utilized as a photosensor. Furthermore, the voltage and frequency dependence of series resistance were calculated from the C-V and G/ω-V measurements and plotted as functions of voltage and frequency. The distribution profile of R S -V gave a peak in the depletion region at low frequencies and disappeared with increasing frequencies.

  13. Sub-band transport mechanism and switching properties for resistive switching nonvolatile memories with structure of silver/aluminum oxide/p-type silicon

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Yanhong; Li, La; Wang, Song; Gao, Ping; Pan, Lujun; Zhang, Jialiang [School of Physics and Optoelectronic Engineering, Dalian University of Technology, No. 2 Linggong Road, Ganjingzi District, Dalian 116024 (China); Zhou, Peng [Department of Microelectronics, State Key Laboratory of ASIC and System, Fudan University, Shanghai 200433 (China); Li, Jinhua; Weng, Zhankun [Center for Nano Metrology and Manufacturing Technologies and International Joint Research Center for Nanophotonics and Biophotonics, Changchun University of Science and Technology, Changchun 130022 (China)

    2015-02-09

    In this paper, we discuss a model of sub-band in resistive switching nonvolatile memories with a structure of silver/aluminum oxide/p-type silicon (Ag/Al{sub x}O{sub y}/p-Si), in which the sub-band is formed by overlapping of wave functions of electron-occupied oxygen vacancies in Al{sub x}O{sub y} layer deposited by atomic layer deposition technology. The switching processes exhibit the characteristics of the bipolarity, discreteness, and no need of forming process, all of which are discussed deeply based on the model of sub-band. The relationships between the SET voltages and distribution of trap levels are analyzed qualitatively. The semiconductor-like behaviors of ON-state resistance affirm the sub-band transport mechanism instead of the metal filament mechanism.

  14. Maximization of Growth Rates During Czochralski Pulling

    Science.gov (United States)

    Wargo, M. J.

    1984-01-01

    It was suggested from theory(1-4) that silicon can be grown from the melt at rates far exceeding the current state of the art. Previous theoretical and experimental investigations which predict maximum rates of pulling during Czochralski growth are reviewed. Several experimental methods are proposed to modify the temperature distribution in a growing crystal to achieve higher rates of pulling. A physical model of a Czochralski crystal of germanium in contact with its melt was used to quantitatively determine, by direct measurement of the axial temperature distribution in the solid, the increase in axial temperature gradients effected by an inverted conical heat reflector located above the melt and coaxially about the physical model. Preliminary results indicate that this is an effective method of increasing the thermal resistance between the hot melt and crucible wall and a growing crystal. Under these conditions the enhancement of the interfacial temperature gradients permit a commensurate increase in the rate of crystal pulling.

  15. The performance of Y2O3 as interface layer between La2O3 and p-type silicon substrate

    Directory of Open Access Journals (Sweden)

    Shulong Wang

    2016-11-01

    Full Text Available In this study, the performance of Y2O3 as interface layer between La2O3 and p-type silicon substrate is studied with the help of atomic layer deposition (ALD and magnetron sputtering technology. The surface morphology of the bilayer films with different structures are observed after rapid thermal annealing (RTA by atomic force microscopy (AFM. The results show that Y2O3/Al2O3/Si structure has a larger number of small spikes on the surface and its surface roughness is worse than Al2O3/Y2O3/Si structure. The reason is that the density of Si substrate surface is much higher than that of ALD growth Al2O3. With the help of high-frequency capacitance-voltage(C-V measurement and conductivity method, the density of interface traps can be calculated. After a high temperature annealing, the metal silicate will generate at the substrate interface and result in silicon dangling bond and interface trap charge, which has been improved by X-ray photoelectron spectroscopy (XPS and interface trap charge density calculation. The interface trapped charge density of La2O3/Al2O3/Si stacked gate structure is lower than that of La2O3/Y2O3/Si gate structure. If Y2O3 is used to replace Al2O3 as the interfacial layer, the accumulation capacitance will increase obviously, which means lower equivalent oxide thickness (EOT. Our results show that interface layer Y2O3 grown by magnetron sputtering can effectively ensure the interface traps near the substrate at relative small level while maintain a relative higher dielectric constant than Al2O3.

  16. Fabrication and characterization of silicon nanowire p-i-n MOS gated diode for use as p-type tunnel FET

    Science.gov (United States)

    Brouzet, V.; Salem, B.; Periwal, P.; Rosaz, G.; Baron, T.; Bassani, F.; Gentile, P.; Ghibaudo, G.

    2015-11-01

    In this paper, we present the fabrication and electrical characterization of a MOS gated diode based on axially doped silicon nanowire (NW) p-i-n junctions. These nanowires are grown by chemical vapour deposition (CVD) using the vapour-liquid-solid (VLS) mechanism. NWs have a length of about 7 \\upmu {m} with 3 \\upmu {m} of doped regions (p-type and n-type) and 1 \\upmu {m} of intrinsic region. The gate stack is composed of 15 nm of hafnium dioxide ({HfO}2), 80 nm of nickel and 120 nm of aluminium. At room temperature, I_{{on}} =-52 {nA}/\\upmu {m} (V_{{DS}}=-0.5 {V}, V_{{GS}}=-4 {V}), and an I_{{on}}/I_{{off}} ratio of about 104 with a very low I_{{off}} current has been obtained. Electrical measurements are carried out between 90 and 390 K, and we show that the I on current is less temperature dependent below 250 K. We also observe that the ON current is increasing between 250 and 390 K. These transfer characteristics at low and high temperature confirm the tunnelling transport mechanisms in our devices.

  17. Impact of strain on gate-induced floating body effect for partially depleted silicon-on-insulator p-type metal–oxide–semiconductor-field-effect-transistors

    Energy Technology Data Exchange (ETDEWEB)

    Lo, Wen-Hung [Department of Physics, National Sun Yat-Sen University, Kaohsiung, Taiwan, ROC (China); Chang, Ting-Chang, E-mail: tcchang@mail.phys.nsysu.edu.tw [Department of Physics, National Sun Yat-Sen University, Kaohsiung, Taiwan, ROC (China); Center for Nanoscience and Nanotechnology, National Sun Yat-Sen University, Kaohsiung, Taiwan, ROC (China); Dai, Chih-Hao [Department of Photonics, National Sun Yat-Sen University, Kaohsiung, Taiwan, ROC (China); Chung, Wan-Lin [Department of Physics, National Sun Yat-Sen University, Kaohsiung, Taiwan, ROC (China); Chen, Ching-En; Ho, Szu-Han [Department of Electronics Engineering, National Chiao Tung University, Hsinchu, Taiwan, ROC (China); Tsai, Jyun-Yu [Department of Physics, National Sun Yat-Sen University, Kaohsiung, Taiwan, ROC (China); Chen, Hua-Mao [Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu, Taiwan, ROC (China); Liu, Guan-Ru [Department of Physics, National Sun Yat-Sen University, Kaohsiung, Taiwan, ROC (China); Cheng, Osbert; Huang, Cheng-Tung [Device Department, United Microelectronics Corporation, Tainan Science Park, Taiwan, ROC (China)

    2013-01-01

    This work investigates impact of mechanical strain on gate-induced-floating-body-effect (GIFBE) for partially depleted silicon-on-insulator p-type metal–oxide–semiconductor field effect transistors (PD SOI p-MOSFETs). First part, the original mechanism of GIFBE on PD SOI p-MOSFETs is studied. The experimental results indicate that GIFBE causes a reduction in oxide electric field (E{sub ox}), resulting in an underestimate of negative-bias temperature instability (NBTI) degradation. This can be attributed to the electrons tunneling from the process-induced partial n{sup +} poly gate and anode electron injection (AEI) model, rather than the electron valence band tunneling (EVB) widely accepted as the mechanism for n-MOSFETs. And then, the second part shows that the strained FB device has less NBTI degradation than the unstrained devices. This behavior can be attributed to the fact that more electron accumulation was induced by strain-induced band gap narrowing, reducing NBTI significantly. - Highlights: ► This work investigates the impact of mechanical strain on GIFBE for PD SOI p-MOSFETs. ► FB device shows an insignificant NBTI due to GIFBE. ► GIFBE results from the partial n{sup +} poly gate and anode electron injection model. ► The strained FB device has less NBTI degradation than unstrained devices. ► We verify the band gap narrowing causes less NBTI on strained FB device.

  18. A novel technique based on a plasma focus device for nano-porous gallium nitride formation on P-type silicon

    Science.gov (United States)

    Sharifi Malvajerdi, S.; Salar Elahi, A.; Habibi, M.

    2017-04-01

    A new deposition formation was observed with a Mather-type Plasma Focus Device (MPFD). MPFD was unitized to fabricate porous Gallium Nitride (GaN) on p-type Silicon (Si) substrate with a (100) crystal orientation for the first time in a deposition process. GaN was deposited on Si with 4 and 7 shots. The samples were subjected to a 3 phase annealing procedure. First, the semiconductors were annealed in the PFD with nitrogen plasma shots after their deposition. Second, a thermal chemical vapor deposition annealed the samples for 1 h at 1050 °C by nitrogen gas at a pressure of 1 Pa. Finally, an electric furnace annealed the samples for 1 h at 1150 °C with continuous flow of nitrogen. Porous GaN structures were observed by Field emission scanning electron microscopy and atomic force microscopy. Furthermore, X-Ray diffraction analysis was carried out to determine the crystallinity of GaN after the samples were annealed. Energy-Dispersive X-Ray Spectroscopy indicated the amount of gallium, nitrogen, and oxygen due to the self-oxidation of the samples. Photoluminescence spectroscopy revealed emissions at 2.94 eV and 3.39 eV, which shows that hexagonal wurtzite crystal structures were formed.

  19. Impact of mechanical stress on gate tunneling currents of germanium and silicon p-type metal-oxide-semiconductor field-effect transistors and metal gate work function

    Science.gov (United States)

    Choi, Youn Sung; Numata, Toshinori; Nishida, Toshikazu; Harris, Rusty; Thompson, Scott E.

    2008-03-01

    Uniaxial four-point wafer bending stress-altered gate tunneling currents are measured for germanium (Ge)/silicon (Si) channel metal-oxide-semiconductor field-effect transistors (MOSFETs) with HfO2/SiO2 gate dielectrics and TiN/P+ poly Si electrodes. Carrier separation is used to measure electron and hole currents. The strain-altered hole tunneling current from the p-type inversion layer of Ge is measured to be ˜4 times larger than that for the Si channel MOSFET, since the larger strain-induced valence band-edge splitting in Ge results in more hole repopulation into a subband with a smaller out-of-plane effective mass and a lower tunneling barrier height. The strain-altered electron tunneling current from the metal gate is measured and shown to change due to strain altering the metal work function as quantified by flatband voltage shift measurements of Si MOS capacitors with TaN electrodes.

  20. Thermoelectric Properties of Czochralski GeSi Crystal

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    In order to discuss the application possibility of SiGe crystal in thermoelectric materials, we investigated the thermoelectric properties of several silicon-germanium alloys with different content, orientation and electric conductive type. As discussed in the experiment result, the absolute value of Seebeck coefficient fluctuates from 300 to 600 μV/K in the whole temperature range. In the present paper, the relationship of Seebeck coefficient against content, orientation and electric conductive type is summarized in detail. The Seebeck coefficient of the sample with 〈111〉orientation is smaller than that in 〈100〉 at the same temperature. Absolute value of P-type is larger than that of N-type except pure Ge. But as the temperature increases, the absolute value of pure Ge decreases many times as quickly as that of other specimens. In addition, the specimens of bulk GeSi alloy crystals for experiment were grown by the Czochralski method through varying the pulling rate during the growing process.

  1. Determination of Ring-OSF Position in Czochralski Silicon Single Crystals by Numerical Analysis of Distribution of Grown-in Defects

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    A numerical analysis technique that incorporates Voronkov's model were examined and used to estimate the distribution of defects during crystal growth. By comparisons of the distribution of the density of LSTD and the position of R-OSF in non-nitrogen-doped (non-N-doped) and nitrogen-doped (N-doped) silicon crystals, it is found that the results of the numerical analyses agree with practically evaluated data. The observations suggest that the R-OSF nucleus is a VO2 complex that is formed by bonds between oxygen atoms and residual vacancies consumed during the formation of void defects. This suggests that Voronkov's model can be used to accurately predict the generation and growth of defects in silicon crystals. This numerical analysis technique was also found to be an effective method of estimating the distribution of defects in silicon crystals during crystal growth.

  2. Optimal Control of Oxygen Concentration in a Magnetic Czochralski Crystal Growth by Response Surface Methodology

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    Concepts and techniques of response surface methodology have been widely applied in many branches of engineering, especially in the chemical and manufacturing areas. This paper presents an application of the methodology in a magnetic crystal Czochralski growth system for single crystal silicon to optimize the oxygen concentration at the crystal growth interface in a cusp magnetic field. The simulation demonstrates that the response surface methodology is a feasible algorithm for the optimization of the Czochralski crystal growth process.

  3. Thermal-capillary analysis of Czochralski and liquid encapsulated Czochralski crystal growth. II - Processing strategies

    Science.gov (United States)

    Derby, J. J.; Brown, R. A.

    1986-01-01

    The pseudosteady-state heat transfer model developed in a previous paper is augmented with constraints for constant crystal radius and melt/solid interface deflection. Combinations of growth rate, and crucible and bottom-heater temperatures are tested as processing parameters for satisfying the constrained thermal-capillary problem over a range of melt volumes corresponding to the sequence occuring during the batchwise Czochralski growth of a small-diameter silicon crystal. The applicability of each processing strategy is judged by the range of existence of the solution, in terms of melt volume and the values of the axial and radial temperature gradients in the crystal.

  4. Radiation Response of Forward Biased Float Zone and Magnetic Czochralski Silicon Detectors of Different Geometry for 1-MeV Neutron Equivalent Fluence Monitoring

    CERN Document Server

    Mekki, J; Dusseau, Laurent; Roche, Nicolas Jean-Henri; Saigne, Frederic; Mekki, Julien; Glaser, Maurice

    2010-01-01

    Aiming at evaluating new options for radiation monitoring sensors in LHC/SLHC experiments, the radiation responses of FZ and MCz custom made silicon detectors of different geometry have been studied up to about 4 x 10(14) n(eq)/cm(2). The radiation response of the devices under investigation is discussed in terms of material type, thickness and active area influence.

  5. Czochralski crystal growth: Modeling study

    Science.gov (United States)

    Dudukovic, M. P.; Ramachandran, P. A.; Srivastava, R. K.; Dorsey, D.

    1986-01-01

    The modeling study of Czochralski (Cz) crystal growth is reported. The approach was to relate in a quantitative manner, using models based on first priniciples, crystal quality to operating conditions and geometric variables. The finite element method is used for all calculations.

  6. Recombination activity of light-activated copper defects in p-type silicon studied by injection- and temperature-dependent lifetime spectroscopy

    Science.gov (United States)

    Inglese, Alessandro; Lindroos, Jeanette; Vahlman, Henri; Savin, Hele

    2016-09-01

    The presence of copper contamination is known to cause strong light-induced degradation (Cu-LID) in silicon. In this paper, we parametrize the recombination activity of light-activated copper defects in terms of Shockley—Read—Hall recombination statistics through injection- and temperature dependent lifetime spectroscopy (TDLS) performed on deliberately contaminated float zone silicon wafers. We obtain an accurate fit of the experimental data via two non-interacting energy levels, i.e., a deep recombination center featuring an energy level at Ec-Et=0.48 -0.62 eV with a moderate donor-like capture asymmetry ( k =1.7 -2.6 ) and an additional shallow energy state located at Ec-Et=0.1 -0.2 eV , which mostly affects the carrier lifetime only at high-injection conditions. Besides confirming these defect parameters, TDLS measurements also indicate a power-law temperature dependence of the capture cross sections associated with the deep energy state. Eventually, we compare these results with the available literature data, and we find that the formation of copper precipitates is the probable root cause behind Cu-LID.

  7. Thermal-capillary analysis of Czochralski and liquid encapsulated Czochralski crystal growth

    Science.gov (United States)

    Derby, J. J.; Brown, R. A.

    1986-01-01

    Results are presented from finite element analysis of the Czochralski (CZ) and Liquid Encapsulated Czochralski (LEC) crystal growth processes based on a thermal-capillary model which governs the heat transfer in the system simultaneously with setting the shapes of the melt/solid interface, the melt and encapsulant menisci, and the radius of a steadily growing crystal. Calculations are performed for the small-scale growth of silicon (CZ) and gallium arsenide (LEC). The effects of melt volume and crucible position relative to the heater on the radius of the crystal and the shape of the melt/solid interface are predicted for the CZ system, and the importance of including an accurate representation of the melt meniscus for modeling the process is demonstrated. The additional effect of an encapsulant layer on heat transfer is treated for the LEC method for the cases of totally transparent and opaque encapsulant. The responses of these LEC prototype systems are examined for changes in pull rate and encapsulant volume.

  8. Effect of heat treatment and cooling rate on minority carrier lifetime of Czochralski silicon%热处理和冷却速率对直拉单晶硅少子寿命的影响

    Institute of Scientific and Technical Information of China (English)

    周潘兵; 柯航; 周浪

    2012-01-01

    Effects of heating temperature and cooling rate on the minority carrier lifetime and the interstitial iron concentration of Czochralski silicon(Cz-Si) were investigated. The results show that the interstitial iron concentration is higher and the minority carrier lifetime is lower than the original level when the Cz-Si are heated in the range of 300-1050 ℃ for 40 min and cooled to room temperature at a rate as fast as 50 ℃/s, and the interstitial iron concentration increases and the minority carrier lifetime decreases with increase of heating temperature. When the Cz-Si wafers are heated in the range of 900-1000 ℃ for 40 min and cooled to room temperature at a rate as fast as 50 ℃/s, above 90% of the iron in silicon is in the form of iron precipitates while the other is kept as interstitial iron. When the Cz- Si wafers are heated at 800, 900 and 1000 ℃ for 40 min, followed by cooling at different rates, the interstitial iron concentration increases and the minority carrier lifetime decreases with increase of the cooling rate from 0. 017 to 50 ℃/s.%研究了加热温度与冷却速率对热处理直拉单晶硅少子寿命和间隙铁含量的影响。结果表明,直拉单晶硅在300~1050℃加热40 min,以50℃/s的速率快冷至室温会提高硅片的间隙铁含量,降低硅片的少子寿命;加热温度越高,快冷后硅片的间隙铁含量越高,少子寿命越低;直拉单晶硅片在900~1050℃加热,当以50℃/s的速率快冷至室温,90%以上的铁以沉淀形式存在,其余的铁以间隙态存在。直拉单晶硅片分别经800、900和1000℃加热40 min后在0.017~50℃/s的速率范围冷却,硅片间隙铁含量随冷却速率增加而增加,少子寿命随冷却速率增加而降低,加热温度越高,间隙铁含量上升的幅度越大,而少子寿命下降的幅度越大。

  9. Growing Organic Crystals By The Czochralski Method

    Science.gov (United States)

    Shields, Angela; Frazier, Donald O.; Penn, Benjamin G.; Aggarwal, M. D.; Wang, W. S.

    1994-01-01

    Apparatus grows high-quality single crystals of organic compounds by Czochralski method. In Czochralski process, growing crystal lifted from middle of molten material without touching walls. Because of low melting temperatures of organic crystals, glass vessels usable. Traditional method for inorganic semiconductors adapted to optically nonlinear organic materials.

  10. TSC measurements on proton-irradiated p-type Si-sensors

    Energy Technology Data Exchange (ETDEWEB)

    Donegani, Elena; Fretwurst, Eckhart; Garutti, Erika; Junkes, Alexandra [University of Hamburg (Germany)

    2016-07-01

    Thin n{sup +}p Si sensors are potential candidates for coping with neutron equivalent fluences up to 2.10{sup 16} n{sub eq}/cm{sup 2} and an ionizing dose in the order of a few MGy, which are expected e.g. for the HL-LHC upgrade. The aim of the present work is to provide experimental data on radiation-induced defects in order to: firstly, get a deeper understanding of the properties of hadron induced defects, and secondly develop a radiation damage model based on microscopic measurements. Therefore, the outcomes of Thermally Stimulated Current measurements on 200 μm thick Float-Zone (FZ) and Magnetic Czochralski (MCz) diodes will be shown, as a results of irradiation with 23 MeV protons and isothermal annealing. The samples were irradiated in the fluence range (0.3-1).10{sup 14} n{sub eq}/cm{sup 2}, so that the maximal temperature at which the TSC signal is still sharply distinguishable from the dark current is 200 K. In particular, special focus will be given to the defect introduction rate and to the issue of boron removal in p-type silicon. Annealing studies allow to distinguish which defects mainly contribute to the leakage current and which to the space charge, and thus correlate microscopic defects properties with macroscopic sensor properties.

  11. Liquid-phase-deposited siloxane-based capping layers for silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Veith-Wolf, Boris [Institute for Solar Energy Research Hamelin (ISFH), Am Ohrberg 1, 31860 Emmerthal (Germany); Wang, Jianhui; Hannu-Kuure, Milja; Chen, Ning; Hadzic, Admir; Williams, Paul; Leivo, Jarkko; Karkkainen, Ari [Optitune International Pte. Ltd., 20 Maxwell Road, #05-08 Maxwell House, Singapore 069113 (Singapore); Schmidt, Jan [Institute for Solar Energy Research Hamelin (ISFH), Am Ohrberg 1, 31860 Emmerthal (Germany); Department of Solar Energy, Institute of Solid-State Physics, Leibniz University Hanover, Appelstrasse 2, 30167 Hanover (Germany)

    2015-02-02

    We apply non-vacuum processing to deposit dielectric capping layers on top of ultrathin atomic-layer-deposited aluminum oxide (AlO{sub x}) films, used for the rear surface passivation of high-efficiency crystalline silicon solar cells. We examine various siloxane-based liquid-phase-deposited (LPD) materials. Our optimized AlO{sub x}/LPD stacks show an excellent thermal and chemical stability against aluminum metal paste, as demonstrated by measured surface recombination velocities below 10 cm/s on 1.3 Ωcm p-type silicon wafers after firing in a belt-line furnace with screen-printed aluminum paste on top. Implementation of the optimized LPD layers into an industrial-type screen-printing solar cell process results in energy conversion efficiencies of up to 19.8% on p-type Czochralski silicon.

  12. 用稻壳硅源水热合成P型分子筛的研究%Study on the hydrothermal synthesis of P-type zeolite from rice husk silicon

    Institute of Scientific and Technical Information of China (English)

    杨君; 马红超; 付颖寰; 宋宇; 王永为; 于春玲; 董晓丽

    2011-01-01

    利用稻壳中丰富的氧化硅为硅源,以Al(OH)3为外加铝源,采用水热法合成P型分子筛.通过实验得到制备P型分子筛的最佳条件:硅铝摩尔比(SiO2/A12O3)为5.6,钠硅摩尔比(Na2O/SiO2)为1.43,水钠摩尔比(H2O/Na2O)为18.3,反应温度为85℃,反应时间为24 h.X射线衍射(XRD)与扫描电镜分析表明,该条件下合成的P型分子筛具有较高的结晶度,无杂相,其Ca2+(以CaCO3计)交换容量可达320 mg/g.该方法为农业副产物的再利用提供了一条有效途径.%P-type zeolite was hydrothermal synthesized with rice husk as silicon source and A1(OH)3 as Al source. Results showed that the optimum composition for synthesis of P-type zeolite was SiO2/AlzO3 molar ratio of 5. 6, Na2O/SiO2 molar ratio of 1. 43, and H2O/Na2O molar ratio of 18. 3, which could give maximum calcium ionic exchange capacity of P-type zeolite for 320 mg/g (equivalent to CaCO3) when the crystallization temperature was 85 ℃ and reacted for 24 h. Analysis of XRD and SEM indicated that the P zeolite synthesized under optimum condition had pure form, single phase and high crystalline, it could be used as wash auxiliary. The method provided an effective way for the reuse of agricultural by-products.

  13. SIMULATION OF HETEROJUNCTION SOLAR CELLS BASED ON p-TYPE SILICON WAFER%p型晶体硅异质结太阳电池光电特性模拟研究

    Institute of Scientific and Technical Information of China (English)

    程雪梅; 孟凡英; 汪建强; 李祥; 黄建华

    2012-01-01

    利用AFORS-HET软件模拟以p型晶体硅为衬底的异质结太阳电池的特性.太阳电池的基本结构为:TCO/n-a-Si∶ H/i-a-Si∶ H/p-c-Si/Ag,通过改变电池材料的特征参量,分析电池输出特性随相关参量变化的规律.结果表明,与ITO相比,以ZnO为透明导电极的电池在短波光和可见光波段光谱响应更强,短路电流密度和电池效率更高.此外,在所建立的电池模型中,限定掺杂型非晶硅层的厚度为10nm,改变本征非晶硅层厚度,模拟研究找到了电池的短路电流、开路电压、填充因子及光电转换效率随本征层厚度变化的规律和最优值,通过模拟研究发现有背场的双面电池比无背场电池的开路电压增加4.8%,最高转换效率达21.25%.%The performance of heterojunction solar cells was investigated in p-type silicon crystalline by using AFORS-HET. From the simulation results, it is found that comparing with using ITO as TCO, the absorption of solar cell with ZnO as its TCO is much stronger in visible light, and the short current(Jsc) is bigger than the former, so the efficiency(Eff) increase. After inserting a thin intrinsic amorphous silicon (a-Si) between the n a-Si and c-Si, the short current and the fill factor both increased rapidly, and the Eff raised. However, the thickness of the intrinsic layer must be strict controlled within 0. 1-1. 0nm in this model. The bifacial heterojunction solar cells with the structure ZnO(80nm)/a-Si n(10nm)/a-Si i(lnm)/c-Si p(0. 3cm)/a-Si i(lnm)/a-Si p+(10nm) was simulated, and the best performance of Eff is 21. 25% .

  14. Potential productivity benefits of float-zone versus Czochralski crystal growth

    Science.gov (United States)

    Abe, T.

    1985-01-01

    Efficient mass production of single-crystal silicon is necessary for the efficient silicon solar arrays needed in the coming decade. However, it is anticipated that there will be difficulty growing such volumes of crystals using conventional Czochralski (Cz) methods. While the productivity of single crystals might increase with a crystal diameter increase, there are two obstacles to the mass production of large diameter Czochralski crystals, the long production cycle due to slow growth rate and the high heat requirements of the furnaces. Also counterproductive would be the large resistivity gradient along the growth direction of the crystals due to impurity concentration. Comparison between Float zone (FZ) and Cz crystal growth on the basis of a crystal 150 mm in diameter is on an order of two to four times in favor of the FZ method. This advantage results from high growth rates and steady-state growth while maintaining a dislocation-free condition and impurity segregation.

  15. Surface property modification of silicon

    Science.gov (United States)

    Danyluk, S.

    1984-01-01

    The main emphasis of this work has been to determine the wear rate of silicon in fluid environments and the parameters that influence wear. Three tests were carried out on single crystal Czochralski silicon wafers: circular and linear multiple-scratch tests in fluids by a pyramidal diamond simulated fixed-particle abrasion; microhardness and three-point bend tests were used to determine the hardness and fracture toughness of abraded silicon and the extent of damage induced by abrasion. The wear rate of (100) and (111) n and p-type single crystal Cz silicon abraded by a pyramidal diamond in ethanol, methanol, acetone and de-ionized water was determined by measuring the cross-sectional areas of grooves of the circular and linear multiple-scratch tests. The wear rate depends on the loads on the diamond and is highest for ethanol and lowest for de-ionized water. The surface morphology of the grooves showed lateral and median cracks as well as a plastically deformed region. The hardness and fracture toughness are critical parameters that influence the wear rate. Microhardness tests were conducted to determine the hardness as influenced by fluids. Median cracks and the damage zone surrounding the indentations were also related to the fluid properties.

  16. DLTS study of the oxygen dimer formation kinetics in silicon

    Science.gov (United States)

    Yarykin, Nikolai; Weber, Jörg

    2009-12-01

    The introduction rates of radiation defects, in particular the X- and M-centers for which the oxygen dimer is a precursor, are investigated as a function of duration of the pre-irradiation heat treatment at 480∘ C in Czochralski-grown silicon both of n- and p-types. The characteristic annealing time to grow the X-center concentration in the n-type crystal is found to be about 1 h in accordance with the model which implies no significant barrier for the dimer formation. The M-center concentration in the p-type crystal is found to be nearly independent of duration of the pre-irradiation annealing after a few minutes transient period. This behavior is ascribed to the stabilization of dimer concentration due to an effective dimer trapping in these samples.

  17. DLTS study of the oxygen dimer formation kinetics in silicon

    Energy Technology Data Exchange (ETDEWEB)

    Yarykin, Nikolai, E-mail: nay@iptm.r [Institute of Microelectronics Technology RAS, 142432 Chernogolovka, Moscow Region (Russian Federation); Weber, Joerg [Technische Universitaet Dresden, 01062 Dresden (Germany)

    2009-12-15

    The introduction rates of radiation defects, in particular the X- and M-centers for which the oxygen dimer is a precursor, are investigated as a function of duration of the pre-irradiation heat treatment at 480 deg. C in Czochralski-grown silicon both of n- and p-types. The characteristic annealing time to grow the X-center concentration in the n-type crystal is found to be about 1 h in accordance with the model which implies no significant barrier for the dimer formation. The M-center concentration in the p-type crystal is found to be nearly independent of duration of the pre-irradiation annealing after a few minutes transient period. This behavior is ascribed to the stabilization of dimer concentration due to an effective dimer trapping in these samples.

  18. P型硅衬底异质结太阳电池的优化设计%Design Optimization of Heterojunction Solar Cells on p-type Silicon Substrates

    Institute of Scientific and Technical Information of China (English)

    汪骏康; 徐静平

    2012-01-01

    The performance of TCO/a-Si∶H(n)/a-Si∶H(i)/c-Si(p)/a-Si∶H(p+)/Ag heterojunction solar cells on p-type silicon substrates was simulated by Afors-het software.Optimal structural parameters of thickness,band gap,doping concentration and interface states density were obtained by the results of software optimization and theoretical analysis.The results indicate that well-performed heterojunction solar cells can be designed by using thin and high doping window layer,passivating the defect states of heterojunction interface with intrinsic layer,and making full use of the mirror effect of back surface field.The optimum performance parameters are Voc=678.9 mV,Jsc=38.33 mA/cm2,FF=84.05%,η=21.87%.%采用Afors-het软件模拟分析了结构为TCO/a-Si:H(n)/a-Si:H(i)/c-Si(p)/a-Si:H(p+)/Ag的p型硅衬底异质结太阳电池的性能,研究了各层厚度、带隙、掺杂浓度以及界面态密度等结构参数和物理参数对电池性能的影响。通过模拟优化,结合理论分析和实际工艺,得到合适的各结构参数取值。采用厚度薄且掺杂高的窗口层,嵌入本征层以钝化异质结界面缺陷,合理利用背场对于少子的背反作用,获得了较佳的太阳电池综合性能:开路电压Voc为678.9mV、短路电流密度Jsc为38.33mA/cm2、填充因子FF为84.05%、转换效率η为21.87%。

  19. Annealing Behavior of New Micro-defects in p-type Large-diameter CZ-Si Crystal

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    New types of defects in 15.24 cm diameter and 20.32 cm diameter Czochralski silicon crystals were found after SCI cleaning. Their annealing behavior was studied. It was suggested that these defects become larger during high temperature annealing and disappear by annealing at 1250℃.

  20. Growth of piezoelectric crystals by Czochralski method

    OpenAIRE

    Cochet-Muchy, D.

    1994-01-01

    The Czochralski method is one of the most widely used industrial technique to grow single-crystals, since it applies to a very large range of compounds, such as semiconductors, oxides, fluorides, etc... Many exhibit piezoelectric properties and some of them find applications in Surface-Acoustic-Waves or Bulk-Acoustic-Waves devices. That explains the large amount of work made on the development of the corresponding growth processes and the high levels of production achieved in the world today....

  1. Characterization and modelling of the boron-oxygen defect activation in compensated n-type silicon

    Energy Technology Data Exchange (ETDEWEB)

    Schön, J.; Niewelt, T.; Broisch, J.; Warta, W.; Schubert, M. C. [Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstr. 2, 79110 Freiburg (Germany)

    2015-12-28

    A study of the activation of the light-induced degradation in compensated n-type Czochralski grown silicon is presented. A kinetic model is established that verifies the existence of both the fast and the slow components known from p-type and proves the quadratic dependence of the defect generation rates of both defects on the hole concentration. The model allows for the description of lifetime degradation kinetics in compensated n-type silicon under various intensities and is in accordance with the findings for p-type silicon. We found that the final concentrations of the slow defect component in compensated n-type silicon only depend on the interstitial oxygen concentration and on neither the boron concentration nor the equilibrium electron concentration n{sub 0}. The final concentrations of the fast defect component slightly increase with increasing boron concentration. The results on n-type silicon give new insight to the origin of the BO defect and question the existing models for the defect composition.

  2. Realization of Ultraviolet Electroluminescence from ZnO Homo junction Fabricated on Silicon Substrate with p-Type ZnO:N Layer Formed by Radical N2O Doping

    Institute of Scientific and Technical Information of China (English)

    SUN Jing-Chang; LIANG Hong-Wei; ZHAO Jian-Ze; BIAN Ji-Ming; FENG Qiu-Ju; WANG Jing-Wei; ZHAO Zi-Wen; DU Guo-Tong

    2008-01-01

    @@ ZnO homojunction light-emitting diodes are fabricated on Si(100) substrates by plasma assisted metal organic chemical vapour deposition, A p-type layer of nitrogen-doped ZnO film is formed using radical N2O as the acceptor precursor.The n-type ZnO layer is composed of un-doped ZnO film.The device exhibits desirable rectifying behaviour with a turn-on voltage of 3.3 V and a reverse breakdown voltage higher than 6 V.Distinct electroluminescence emissions centred at 395nm and 49Ohm are detected from this device at forvcard current higher than 20mA at room temperature.

  3. Low-Programmable-Voltage Nonvolatile Memory Devices Based on Omega-shaped Gate Organic Ferroelectric P(VDF-TrFE) Field Effect Transistors Using p-type Silicon Nanowire Channels

    Institute of Scientific and Technical Information of China (English)

    Ngoc Huynh Van; Jae-Hyun Lee; Dongmok Whang; Dae Joon Kang

    2015-01-01

    A facile approach was demonstrated for fabricating high-performance nonvolatile memory devices based on ferroelectric-gate field effect transistors using a p-type Si nanowire coated with omega-shaped gate organic ferroelectric poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)). We overcame the interfacial layer problem by incorporating P(VDF-TrFE) as a ferroelectric gate using a low-temperature fabrication process. Our memory devices exhibited excellent memory characteristics with a low programming voltage of ±5 V, a large modulation in channel conductance between ON and OFF states exceeding 105, a long retention time greater than 3 9 104 s, and a high endurance of over 105 programming cycles while maintaining an ION/IOFF ratio higher than 102.

  4. Fabrication of p-type lithium niobate crystals by molybdenum doping and polarization

    Science.gov (United States)

    Tian, Tian; Kong, Yongfa; Liu, Hongde; Liu, Shiguo; Li, Wei; Chen, Shaolin; Xu, Jiayue

    2017-06-01

    The lack of p-type lithium niobate limits it serving as an active material. A series of Mo-doped and pure congruent lithium niobate crystals were grown by Czochralski method under different polarization conditions. Their dominant carrier species were characterized by holographic experiment. The results showed dominant charge carrier species may be changed from electrons to holes when lithium niobate crystal was doped with Mo ions and polarized under the current of 70mA for 30 minutes. It indicated that p-type lithium niobate crystal could be fabricated by Mo-doping and suitably controlling the polarization condition. Mo-doped lithium niobate crystals can be a promising candidate for active components.

  5. A Sensor Fusion Algorithm for Filtering Pyrometer Measurement Noise in the Czochralski Crystallization Process

    Directory of Open Access Journals (Sweden)

    M. Komperød

    2011-01-01

    Full Text Available The Czochralski (CZ crystallization process is used to produce monocrystalline silicon for solar cell wafers and electronics. Tight temperature control of the molten silicon is most important for achieving high crystal quality. SINTEF Materials and Chemistry operates a CZ process. During one CZ batch, two pyrometers were used for temperature measurement. The silicon pyrometer measures the temperature of the molten silicon. This pyrometer is assumed to be accurate, but has much high-frequency measurement noise. The graphite pyrometer measures the temperature of a graphite material. This pyrometer has little measurement noise. There is quite a good correlation between the two pyrometer measurements. This paper presents a sensor fusion algorithm that merges the two pyrometer signals for producing a temperature estimate with little measurement noise, while having significantly less phase lag than traditional lowpass- filtering of the silicon pyrometer. The algorithm consists of two sub-algorithms: (i A dynamic model is used to estimate the silicon temperature based on the graphite pyrometer, and (ii a lowpass filter and a highpass filter designed as complementary filters. The complementary filters are used to lowpass-filter the silicon pyrometer, highpass-filter the dynamic model output, and merge these filtered signals. Hence, the lowpass filter attenuates noise from the silicon pyrometer, while the graphite pyrometer and the dynamic model estimate those frequency components of the silicon temperature that are lost when lowpass-filtering the silicon pyrometer. The algorithm works well within a limited temperature range. To handle a larger temperature range, more research must be done to understand the process' nonlinear dynamics, and build this into the dynamic model.

  6. Temperature-dependent Hall effect measurements on Cz-grown silicon pulled from compensated and recycled feedstock materials

    Science.gov (United States)

    Zhang, Song; Modanese, Chiara; Di Sabatino, Marisa; Tranell, Gabriella

    2015-11-01

    In this work, temperature-dependent Hall effect measurements in the temperature range 88-350 K were carried out to investigate the electrical properties of three solar grade p-type Czochralski (Cz) silicon ingots, pulled from recycled p-type multi-crystalline silicon top cuts and compensated solar grade (SoG) feedstock. Material bulk properties including Hall mobility, carrier density and resistivity as functions of temperature were studied to evaluate the influence of compensation and impurities. Recycled top cut replacing poly-silicon as feedstock leads to a more uniform resistivity. In addition, higher concentrations of O and C, give rise to oxygen related defects, which act as neutral scattering centers displaying only a slight influence on the electrical properties at low temperature compared to the dominant compensation effect. The electrical performances of all samples are shown to be strongly dependent on compensation level, especially at the lowest temperature (~88 K). A significant presence of incompletely ionized phosphorus was deduced through the measured carrier density. The temperature-dependent Hall effect measurements fit Klaassen's mobility model very well at low temperatures (silicon, while the deviation at the high temperature probably may be accounted for by the presence of as-grown defects, such as oxygen related defects and phosphorus clusters, which are usually neglected in most mobility models.

  7. Mathematical modeling and numerical simulation of Czochralski Crystal Growth

    Energy Technology Data Exchange (ETDEWEB)

    Jaervinen, J.; Nieminen, R. [Center for Scientific Computing, Espoo (Finland)

    1996-12-31

    A detailed mathematical model and numerical simulation tools based on the SUPG Finite Element Method for the Czochralski crystal growth has been developed. In this presentation the mathematical modeling and numerical simulation of the melt flow and the temperature distribution in a rotationally symmetric crystal growth environment is investigated. The temperature distribution and the position of the free boundary between the solid and liquid phases are solved by using the Enthalpy method. Heat inside of the Czochralski furnace is transferred by radiation, conduction and convection. The melt flow is governed by the incompressible Navier-Stokes equations coupled with the enthalpy equation. The melt flow is numerically demonstrated and the temperature distribution in the whole Czochralski furnace. (author)

  8. A review of high-efficiency silicon solar cells

    Science.gov (United States)

    Rohatgi, A.

    1986-01-01

    Various parameters that affect solar cell efficiency were discussed. It is not understood why solar cells produced from less expensive Czochralski (Cz) silicon are less efficient than cells fabricated from more expensive float-zone (Fz) silicon. Performance characteristics were presented for recently produced, high-efficient solar cells fabricated by Westinghouse Electric Corp., Spire Corp., University of New South Wales, and Stanford University.

  9. 19.4%-efficient large-area fully screen-printed silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Gatz, Sebastian; Hannebauer, Helge; Hesse, Rene; Werner, Florian; Schmidt, Arne; Dullweber, Thorsten; Bothe, Karsten [Institute for Solar Energy Hamelin (ISFH), Am Ohrberg 1, 31860 Emmerthal (Germany); Schmidt, Jan; Brendel, Rolf [Institute for Solar Energy Hamelin (ISFH), Am Ohrberg 1, 31860 Emmerthal (Germany); Institute of Solid-State Physics, University of Hannover, Appelstrasse 2, 30167 Hannover (Germany)

    2011-04-15

    We demonstrate industrially feasible large-area solar cells with passivated homogeneous emitter and rear achieving energy conversion efficiencies of up to 19.4% on 125 x 125 mm{sup 2} p-type 2-3 {omega} cm boron-doped Czochralski silicon wafers. Front and rear metal contacts are fabricated by screen-printing of silver and aluminum paste and firing in a conventional belt furnace. We implement two different dielectric rear surface passivation stacks: (i) a thermally grown silicon dioxide/silicon nitride stack and (ii) an atomic-layer-deposited aluminum oxide/silicon nitride stack. The dielectrics at the rear result in a decreased surface recombination velocity of S{sub rear} = 70 cm/s and 80 cm/s, and an increased internal IR reflectance of up to 91% corresponding to an improved J{sub sc} of up to 38.9 mA/cm{sup 2} and V{sub oc} of up to 664 mV. We observe an increase in cell efficiency of 0.8% absolute for the cells compared to 18.6% efficient reference solar cells featuring a full-area aluminum back surface field. To our knowledge, the energy conversion efficiency of 19.4% is the best value reported so far for large area screen-printed solar cells. (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  10. Rapid mitigation of carrier-induced degradation in commercial silicon solar cells

    Science.gov (United States)

    Hallam, Brett J.; Chan, Catherine E.; Chen, Ran; Wang, Sisi; Ji, Jingjia; Mai, Ly; Abbott, Malcolm D.; Payne, David N. R.; Kim, Moonyong; Chen, Daniel; Chong, CheeMun; Wenham, Stuart R.

    2017-08-01

    We report on the progress for the understanding of carrier-induced degradation (CID) in p-type mono and multi-crystalline silicon (mc-Si) solar cells, and methods of mitigation. Defect formation is a key aspect to mitigating CID. Illuminated annealing can be used for both mono and mc-Si solar cells to reduce CID. The latest results of an 8-s UNSW advanced hydrogenation process applied to industrial p-type Czochralski PERC solar cells are shown with average efficiency enhancements of 1.1% absolute from eight different solar cell manufacturers. Results from three new industrial CID mitigation tools are presented, reducing CID to 0.8-1.1% relative, compared to 4.2% relative on control cells. Similar advanced hydrogenation processes can also be applied to multi-crystalline silicon passivated emitter with rear local contact (PERC) cells, however to date, the processes take longer and are less effective. Modifications to the firing processes can also suppress CID in multi-crystalline cells during subsequent illumination. The most stable results are achieved with a multi-stage process consisting of a second firing process at a reduced firing temperature, followed by extended illuminated annealing.

  11. Evolution of plant P-type ATPases

    Directory of Open Access Journals (Sweden)

    Christian N.S. Pedersen

    2012-02-01

    Full Text Available Five organisms having completely sequenced genomes and belonging to all major branches of green plants (Viridiplantae were analyzed with respect to their content of P-type ATPases encoding genes. These were the chlorophytes Ostreococcus tauria and Chlamydomonas reinhardtii, and the streptophytes Physcomitrella patens (a moss, Selaginella moellendorffii (a primitive vascular plant, and Arabidopsis thaliana (a model flowering plant. Each organism contained sequences for all five subfamilies of P-type ATPases. Our analysis demonstrates when specific subgroups of P-type ATPases disappeared in the evolution of Angiosperms. Na/K-pump related P2C ATPases were lost with the evolution of streptophytes whereas Na+ or K+ pumping P2D ATPases and secretory pathway Ca2+-ATPases remained until mosses. An N-terminally located calmodulin binding domain in P2B ATPases can only be detected in pumps from Streptophytae, whereas, like in animals, a C-terminally localized calmodulin binding domain might be present in chlorophyte P2B Ca2+-ATPases. Chlorophyte genomes encode P3A ATPases resembling protist plasma membrane H+-ATPases and a C-terminal regulatory domain is missing. The complete inventory of P-type ATPases in the major branches of Viridiplantae is an important starting point for elucidating the evolution in plants of these important pumps.

  12. Total dose dependence of oxide charge, interstrip capacitance and breakdown behavior of sLHC prototype silicon strip detectors and test structures of the SMART collaboration

    Energy Technology Data Exchange (ETDEWEB)

    Sadrozinski, H.F.-W. [SCIPP, UC Santa Cruz, Santa Cruz, CA 95064 (United States)], E-mail: hartmut@scipp.ucsc.edu; Betancourt, C.; Heffern, R.; Henderson, I.; Pixley, J.; Polyakov, A.; Wilder, M. [SCIPP, UC Santa Cruz, Santa Cruz, CA 95064 (United States); Boscardin, M.; Piemonte, C.; Pozza, A.; Zorzi, N. [ITC-irst, Divisione Microsistemi, Via Sommarive 18, I-38050 Povo, Trento (Italy); Dalla Betta, G.-F.; Resta, G. [DIT, Universita di Trento, Via Sommarive 14, I-38050 Povo, Trento (Italy); Bruzzi, M. [Dipt. Energetica, University of Florence, Via S. Marta 3, I-50139 Florence (Italy); Macchiolo, A. [Universita and INFN Florence, Via G. Sansone 1, I-50019 Sesto F. (Italy); Borrello, L.; Messineo, A. [Universita and INFN Pisa, Largo B. Pontecorvo, 3, I-56127 Pisa (Italy); Creanza, D.; Manna, N. [Universita and INFN Bari, Via E. Orabona 4, I-70126 Bari (Italy)

    2007-09-01

    Within the R and D Program for the luminosity upgrade proposed for the Large Hadron Collider (LHC), silicon strip detectors (SSD) and test structures (TS) were manufactured on several high-resistivity substrates: p-type Magnetic Czochralski (MCz) and Float Zone (FZ), and n-type FZ. To test total dose (TID) effects they were irradiated with {sup 60}Co gammas and the impact of surface radiation damage on the detector properties was studied. Selected results from the pre-rad and post-rad characterization of detectors and TS are presented, in particular interstrip capacitance and resistance, break-down voltage, flatband voltage and oxide charge. Surface damage effects show saturation after 150 krad and breakdown performance improves considerably after 210 krad. Annealing was performed both at room temperature and at 60 deg. C, and large effects on the surface parameters observed.

  13. Doping Silicon Wafers with Boron by Use of Silicon Paste

    Institute of Scientific and Technical Information of China (English)

    Yu Gao; Shu Zhou; Yunfan Zhang; Chen Dong; Xiaodong Pi; Deren Yang

    2013-01-01

    In this work we introduce recently developed silicon-paste-enabled p-type doping for silicon.Boron-doped silicon nanoparticles are synthesized by a plasma approach.They are then dispersed in solvents to form silicon paste.Silicon paste is screen-printed at the surface of silicon wafers.By annealing,boron atoms in silicon paste diffuse into silicon wafers.Chemical analysis is employed to obtain the concentrations of boron in silicon nanoparticles.The successful doping of silicon wafers with boron is evidenced by secondary ion mass spectroscopy (SIMS) and sheet resistance measurements.

  14. Dendritic web - A viable material for silicon solar cells

    Science.gov (United States)

    Seidensticker, R. G.; Scudder, L.; Brandhorst, H. W., Jr.

    1975-01-01

    The dendritic web process is a technique for growing thin silicon ribbon from liquid silicon. The material is suitable for solar cell fabrication and, in fact, cells fabricated on web material are equivalent in performance to cells fabricated on Czochralski-grown material. A recently concluded study has delineated the thermal requirements for silicon web crucibles, and a detailed conceptual design has been developed for a laboratory growth apparatus.

  15. Nickel Electroless Plating: Adhesion Analysis for Mono-Type Crystalline Silicon Solar Cells.

    Science.gov (United States)

    Shin, Eun Gu; Rehman, Atteq ur; Lee, Sang Hee; Lee, Soo Hong

    2015-10-01

    The adhesion of the front electrodes to silicon substrate is the most important parameters to be optimized. Nickel silicide which is formed by sintering process using a silicon substrate improves the mechanical and electrical properties as well as act as diffusion barrier for copper. In this experiment p-type mono-crystalline czochralski (CZ) silicon wafers having resistivity of 1.5 Ω·cm were used to study one step and two step nickel electroless plating process. POCl3 diffusion process was performed to form the emitter with the sheet resistance of 70 ohm/sq. The Six, layer was set down as an antireflection coating (ARC) layer at emitter surface by plasma enhanced chemical vapor deposition (PECVD) process. Laser ablation process was used to open SiNx passivation layer locally for the formation of the front electrodes. Nickel was deposited by electroless plating process by one step and two step nickel electroless deposition process. The two step nickel plating was performed by applying a second nickel deposition step subsequent to the first sintering process. Furthermore, the adhesion analysis for both one step and two steps process was conducted using peel force tester (universal testing machine, H5KT) after depositing Cu contact by light induced plating (LIP).

  16. P-type transparent conducting oxides

    Science.gov (United States)

    Zhang, Kelvin H. L.; Xi, Kai; Blamire, Mark G.; Egdell, Russell G.

    2016-09-01

    Transparent conducting oxides constitute a unique class of materials combining properties of electrical conductivity and optical transparency in a single material. They are needed for a wide range of applications including solar cells, flat panel displays, touch screens, light emitting diodes and transparent electronics. Most of the commercially available TCOs are n-type, such as Sn doped In2O3, Al doped ZnO, and F doped SnO2. However, the development of efficient p-type TCOs remains an outstanding challenge. This challenge is thought to be due to the localized nature of the O 2p derived valence band which leads to difficulty in introducing shallow acceptors and large hole effective masses. In 1997 Hosono and co-workers (1997 Nature 389 939) proposed the concept of ‘chemical modulation of the valence band’ to mitigate this problem using hybridization of O 2p orbitals with close-shell Cu 3d 10 orbitals. This work has sparked tremendous interest in designing p-TCO materials together with deep understanding the underlying materials physics. In this article, we will provide a comprehensive review on traditional and recently emergent p-TCOs, including Cu+-based delafossites, layered oxychalcogenides, nd 6 spinel oxides, Cr3+-based oxides (3d 3) and post-transition metal oxides with lone pair state (ns 2). We will focus our discussions on the basic materials physics of these materials in terms of electronic structures, doping and defect properties for p-type conductivity and optical properties. Device applications based on p-TCOs for transparent p-n junctions will also be briefly discussed.

  17. Stoichiometry-controlled compensation in liquid encapsulated Czochralski GaAs

    Science.gov (United States)

    Holmes, D. E.; Chen, R. T.; Elliott, K. R.; Kirkpatrick, C. G.

    1982-01-01

    It is shown that the electrical compensation of undoped GaAs grown by the liquid encapsulated Czochralski technique is controlled by the melt stoichiometry. The concentration of the deep donor EL2 in the crystal depends on the As concentration in the melt, increasing from about 5 x 10 to the 15th per cu cm to 1.7 x 10 to the 16th per cu cm as the As atom fraction increases from 0.48 to 0.51. Furthermore, it is shown that the free-carrier concentration of semi-insulating GaAs is determined by the relative concentrations of EL2 and carbon acceptors. As a result, semi-insulating material can be obtained only above a critical As concentration (0.475-atom fraction in the material here) where the concentration of EL2 is sufficient to compensate residual acceptors. Below the critical As concentration the material is p type due to excess acceptors.

  18. Empirical Modeling of Heating Element Power for the Czochralski Crystallization Process

    Directory of Open Access Journals (Sweden)

    Magnus Komperød

    2010-01-01

    Full Text Available The Czochralski (CZ crystallization process is used to produce monocrystalline silicon. Monocrystalline silicon is used in solar cell wafers and in computers and electronics. The CZ process is a batch process, where multicrystalline silicon is melted in a crucible and later solidifies on a monocrystalline seed crystal. The crucible is heated using a heating element where the power is manipulated using a triode for alternating current (TRIAC. As the electric resistance of the heating element increases by increased temperature, there are significant dynamics from the TRIAC input signal (control system output to the actual (measured heating element power. The present paper focuses on empirical modeling of these dynamics. The modeling is based on a dataset logged from a real-life CZ process. Initially the dataset is preprocessed by detrending and handling outliers. Next, linear ARX, ARMAX, and output error (OE models are identfied. As the linear models do not fully explain the process' behavior, nonlinear system identification is applied. The Hammerstein-Wiener (HW model structure is chosen. The final model identified is a Hammerstein model, i.e. a HW model with nonlinearity at the input, but not at the output. This model has only one more identified parameter than the linear OE model, but still improves the optimization criterion (mean squared ballistic simulation errors by a factor of six. As there is no nonlinearity at the output, the dynamics from the prediction error to the model output are linear, which allows a noise model to be added. Comparison of a Hammerstein model with noise model and the linear ARMAX model, both optimized for mean squared one-step-ahead prediction errors, shows that this optimization criterion is 42% lower for the Hammerstein model. Minimizing the number of parameters to be identified has been an important consideration throughout the modeling work.

  19. Radiation damage in silicon detectors

    CERN Document Server

    Lindström, G

    2003-01-01

    Radiation damage effects in silicon detectors under severe hadron and gamma-irradiation are surveyed, focusing on bulk effects. Both macroscopic detector properties (reverse current, depletion voltage and charge collection) as also the underlying microscopic defect generation are covered. Basic results are taken from the work done in the CERN-RD48 (ROSE) collaboration updated by results of recent work. Preliminary studies on the use of dimerized float zone and Czochralski silicon as detector material show possible benefits. An essential progress in the understanding of the radiation-induced detector deterioration had recently been achieved in gamma irradiation, directly correlating defect analysis data with the macroscopic detector performance.

  20. Titanium distribution in Ti-sapphire single crystals grown by Czochralski and Verneuil technique

    Science.gov (United States)

    Alombert-Goget, G.; Li, H.; Faria, J.; Labor, S.; Guignier, D.; Lebbou, K.

    2016-01-01

    The distributions of Ti3+ and Ti4+ ions were evaluated by photoluminescence measurement in the wafers cut from different positions of the ingots grown by Czochralski and Verneuil techniques. Particular radial distributions of Ti4+ as function of the position in the ingot were observed in the crystals grown by Verneuil technique different than the crystals grown by Czochralski method.

  1. Manipulation of space charge in silicon by intentional thermal donor activation

    Institute of Scientific and Technical Information of China (English)

    E. TUOVINEN; J. H(A)RK(O)NEN; P. LUUKKA; E. TUOMINEN

    2006-01-01

    A quantitative study about the thermal activation of thermal donors (TD) in high resistivity magnetic Czochralski (MCz) silicon was carried out. The samples are p+/p/n+ diodes (active area 0.25 cm2, thickness 300 μm) made of MCz p-type Si wafers with the resistivity of about 2 kΩ-cm. The concentration of interstitial oxygen (Oi) in this material was measured by the Fourier transformation infrared (FTIR) spectroscopy method and it is 4.9×1017 cm-3. The TD activation was performed through an isochronal thermal treatment at 430 ℃ up to a total time of 120 min. The space charge density after each annealing step was extracted from capacitance-voltage (CV) measurements. The TD generation can be utilized in processing of silicon detectors (pixel, strip and drift detectors) that are used e.g. in space applications, high-energy physics experiments, and several visual imaging applications. If the starting material is boron-doped p-type high-resistivity Cz-Si, the TD generation process can be utilized in order to produce p+/n-/n+ detectors. The last thermal process step, i.e. the sintering of aluminum, is intentionally carried out at the temperature where TD's are created. Due to the generated donors, the p-type bulk will eventually be compensated to n-type bulk. Moreover, the full depletion voltage of detectors (Vfd) could be tailored between a wide range from 30 V up to almost 1 000 V by changing heat treatment duration at 400-450 ℃ from 20 to 120 min.

  2. Silicon Sensor and Detector Developments for the CMS Tracker Upgrade

    CERN Document Server

    D'Alessandro, Raffaello

    2011-01-01

    CMS started a campaign to identify the future silicon sensor technology baseline for a new Tracker for the high-luminosity phase of LHC, coupled to a new effective way of providing tracking information to the experiment trigger. To this end a large variety of 6'' wafers was acquired in different thicknesses and technologies at HPK and new detector module designs were investigated. Detector thicknesses ranging from 50$\\mu$m to 300$\\mu$m are under investigation on float zone, magnetic Czochralski and epitaxial material both in n-in-p and p-in-n versions. P-stop and p-spray are explored as isolation technology for the n-in-p type sensors as well as the feasibility of double metal routing on 6'' wafers. Each wafer contains different structures to answer different questions, e.g. influence of geometry, Lorentz angle, radiation tolerance, annealing behaviour, validation of read-out schemes. Dedicated process test-structures, as well as diodes, mini-sensors, long and very short strip sensors and real pixel sensors ...

  3. Investigation of Backside Textures for Genesis Solar Wind Silicon Collectors

    Science.gov (United States)

    Gonzalez, C. P.; Burkett, P. J.; Rodriguez, M. C.; Allton, J. H.

    2014-01-01

    Genesis solar wind collectors were comprised of a suite of 15 types of ultrapure materials. The single crystal, pure silicon collectors were fabricated by two methods: float zone (FZ) and Czochralski (CZ). Because of slight differences in bulk purity and surface cleanliness among the fabrication processes and the specific vendor, it is desirable to know which variety of silicon and identity of vendor, so that appropriate reference materials can be used. The Czochralski method results in a bulk composition with slightly higher oxygen, for example. The CZ silicon array wafers that were Genesis-flown were purchased from MEMC Electronics. Most of the Genesis-flown FZ silicon was purchased from Unisil and cleaned by MEMC, although a few FZ wafers were acquired from International Wafer Service (IWS).

  4. Efficiency Improvement of HIT Solar Cells on p-Type Si Wafers

    Directory of Open Access Journals (Sweden)

    Chun-You Wei

    2013-11-01

    Full Text Available Single crystal silicon solar cells are still predominant in the market due to the abundance of silicon on earth and their acceptable efficiency. Different solar-cell structures of single crystalline Si have been investigated to boost efficiency; the heterojunction with intrinsic thin layer (HIT structure is currently the leading technology. The record efficiency values of state-of-the art HIT solar cells have always been based on n-type single-crystalline Si wafers. Improving the efficiency of cells based on p-type single-crystalline Si wafers could provide broader options for the development of HIT solar cells. In this study, we varied the thickness of intrinsic hydrogenated amorphous Si layer to improve the efficiency of HIT solar cells on p-type Si wafers.

  5. A silicon sheet casting experiment. [for solar cell water production

    Science.gov (United States)

    Bickler, D. B.; Sanchez, L. E.; Sampson, W. J.

    1980-01-01

    The casting of silicon blanks for solar cells directly without slicing is an exciting concept. An experiment was performed to investigate the feasibility of developing a machine that casts wafers directly. A Czochralski furnace was modified to accept a graphite ingot-simulating fixture. Silicon was melted in the middle of the ingot simulator in a boron nitride mold. Sample castings showed reasonable crystal size. Solar cells were made from the cast blanks. The performance is reported.

  6. Modeling of dislocation dynamics in germanium Czochralski growth

    Science.gov (United States)

    Artemyev, V. V.; Smirnov, A. D.; Kalaev, V. V.; Mamedov, V. M.; Sidko, A. P.; Podkopaev, O. I.; Kravtsova, E. D.; Shimansky, A. F.

    2017-06-01

    Obtaining very high-purity germanium crystals with low dislocation density is a practically difficult problem, which requires knowledge and experience in growth processes. Dislocation density is one of the most important parameters defining the quality of germanium crystal. In this paper, we have performed experimental study of dislocation density during 4-in. germanium crystal growth using the Czochralski method and comprehensive unsteady modeling of the same crystal growth processes, taking into account global heat transfer, melt flow and melt/crystal interface shape evolution. Thermal stresses in the crystal and their relaxation with generation of dislocations within the Alexander-Haasen model have been calculated simultaneously with crystallization dynamics. Comparison to experimental data showed reasonable agreement for the temperature, interface shape and dislocation density in the crystal between calculation and experiment.

  7. Flow transitions in model Czochralski GaAs melt

    Institute of Scientific and Technical Information of China (English)

    CHEN Shu-xian; LI Ming-wei

    2006-01-01

    The flow and heat transfer of molten GaAs during Czochralski growth are studied with a time-dependent and three-dimensional turbulent flow model. A transition from axisymmetric flow to non-axisymmetric flow and then back to axisymmetric flow again with increasing the crucible rotation rate is predicted. In the non-axisymmetric regime, the thermal wave induced by the combination of coriolis force, buoyancy and viscous force in the GaAs melt is predicted for the first time. The thermal wave is confirmed to be baroclinic thermal wave. The origin of the transition to non-axisymmetric flow is baroclinic instability. The critical parameters for the transitions are presented, which are quantitatively in agreement with Fein and Preffer's experimental results. The calculated results can be taken as a reference for the growth of GaAs single-crystal of high quality.

  8. Physical modelling of Czochralski crystal growth in horizontal magnetic field

    Science.gov (United States)

    Grants, Ilmārs; Pal, Josef; Gerbeth, Gunter

    2017-07-01

    This study addresses experimentally the heat transfer, the temperature azimuthal non-uniformity and the onset of oscillations in a low temperature physical model of a medium-sized Czochralski crystal growth process with a strong horizontal magnetic field (HMF). It is observed that under certain conditions the integral heat flux may decrease with increasing magnetic field strength at the same time as the flow velocity increases. The azimuthal non-uniformity of the temperature field in the melt near the crystal model rim is only little influenced by its rotation rate outside of a narrow range where the centrifugal force balances the buoyant one. The flow oscillation onset has been observed for two values of the HMF strength. Conditions of this onset are little influenced by the crystal rotation. The critical temperature difference of the oscillation onset considerably exceeds that of the Rayleigh-Bénard (RB) cell in a strong HMF.

  9. The growth of Ho:YAG single crystals by Czochralski method and investigating the formed cores

    Energy Technology Data Exchange (ETDEWEB)

    Hasani Barbaran, J., E-mail: jhasani@aeoi.org.ir; Ghani Aragi, M. R.; Javaheri, I.; Baharvand, B.; Tabasi, M.; Layegh Ahan, R.; Jangjo, E. [NSTRI, Laser and Optics Research School (Iran, Islamic Republic of)

    2015-12-15

    Ho:YAG single crystals were grown by Czochralski technique, and investigated by the X-ray diffraction (XRD) and optical methods. The crystals were cut and polished in order to observe and analyze their cores. It was found that the deviation of the cores formed in the Czochralski grown Ho:YAG single crystals are resulted from non-symmetrical status of thermal insulation around the Iridium crucible.

  10. Impact of common metallurgical impurities on ms-Si solar cell efficiency. P-type versus n-type doped ingots

    Energy Technology Data Exchange (ETDEWEB)

    Geerligs, L.J.; Manshanden, P. [ECN Solar Energy, Petten (Netherlands); Solheim, I.; Ovrelid, E.J.; Waernes, A.N. [Sintef materials technology, Trondheim (Norway)

    2006-09-15

    Silicon solar cells based on n-type silicon wafers are less sensitive to carrier lifetime degradation due to several common metal impurities than p-base cells. The theoretical and experimental indications for this have recently received considerable attention. This paper compares p-type and n-type cells purposely contaminated with relatively high levels of impurities, processed by industrial techniques. The impurities considered are Al, Ti, and Fe, which are the dominant impurities in metallurgical silicon and natural quartz. The work also preliminary addresses the question whether the optimal wafer resistivity is the same for n-type as for p-type base mc-Si cells.

  11. An integrated driving circuit implemented with p-type LTPS TFTs for AMOLED

    Institute of Scientific and Technical Information of China (English)

    ZHAO Li-qing; WU Chun-ya; HAO Da-shou; YAO Ying; MENG Zhi-guo; XIONG Shao-zhen

    2009-01-01

    Based on the technology of low temperature poly silicon thin film transistors (poly-Si-TFTs), a novel p-type TFT AMOLED panel with self-scanned driving circuit is introduced in this paper. A shift register formed with novel p-type TFTs is pro-posed to realize the gate driver. A flip-latch cooperated with the shift register is designed to conduct the data writing. In order to verify the validity of the proposed design, the circuits are simulated with SILVACO TCAD tools, using the MODEL in which the parameters of LTPS TFTs were extracted from the LTPS TFTs made in our lab. The simulation results indicate that the circuit can fulfill the driving function.

  12. Piezoelectric Nanogenerator Using p-Type ZnO Nanowire Arrays

    KAUST Repository

    Lu, Ming-Pei

    2009-03-11

    Using phosphorus-doped ZnO nanowire (NW) arrays grown on silicon substrate, energy conversion using the p-type ZnO NWs has been demonstrated for the first time. The p-type ZnO NWs produce positive output voltage pulses when scanned by a conductive atomic force microscope (AFM) in contact mode. The output voltage pulse is generated when the tip contacts the stretched side (positive piezoelectric potential side) of the NW. In contrast, the n-type ZnO NW produces negative output voltage when scanned by the AFM tip, and the output voltage pulse is generated when the tip contacts the compressed side (negative potential side) of the NW. In reference to theoretical simulation, these experimentally observed phenomena have been systematically explained based on the mechanism proposed for a nanogenerator. © 2009 American Chemical Society.

  13. Thermal-capillary model for Czochralski growth of semiconductor materials

    Science.gov (United States)

    Derby, J. J.; Brown, R. A.

    1985-01-01

    The success of efficiently calculating the temperature field, crystal radius, melt mensicus, and melt/solid interface in the Czochralski crystal growth system by full finite-element solution of the government thermal-capillary model is demonstrated. The model predicts realistic response to changes in pull rate, melt volume, and the thermal field. The experimentally observed phenomena of interface flipping, bumping, and the difficulty maintaining steady-state growth as the melt depth decreases are explained by model results. These calculations will form the basis for the first quantitative picture of Cz crystal growth. The accurate depiction of the melt meniscus is important in calculating the crystal radius and solidification interface. The sensitivity of the results to the equilibrium growth angle place doubt on less sophisticated attempts to model the process without inclusion of the meniscus. Quantitative comparison with experiments should be possible once more representation of the radiation and view factors in the thermal system and the crucible are included. Extensions of the model in these directions are underway.

  14. Determination of the p-spray profile for n+ p silicon sensors using a MOSFET

    Science.gov (United States)

    Fretwurst, E.; Garutti, E.; Klanner, R.; Kopsalis, I.; Schwandt, J.; Weberpals, M.

    2017-09-01

    The standard technique to electrically isolate the n+ implants of segmented silicon sensors fabricated on high-ohmic p-type silicon are p+-implants. Although the knowledge of the p+-implant dose and of the doping profile is highly relevant for the understanding and optimisation of sensors, this information is usually not available from the vendors, and methods to obtain it are highly welcome. The paper presents methods to obtain this information from circular MOSFETs fabricated as test structures on the same wafer as the sensors. Two circular MOSFETs, one with and one without a p+-implant under the gate, are used for this study. They were produced on Magnetic Czochralski silicon doped with ≈ 3 . 5 × 1012cm-2 of boron and crystal orientation. The drain-source current as function of gate voltage for different back-side voltages is measured at a drain-source voltage of 50 mV in the linear MOSFET region, and the values of threshold voltage and mobility extracted using the standard MOSFET formulae. To determine the bulk doping, the implantation dose and profile from the data, two methods are used, which give compatible results. The doping profile, which varies between 3 . 5 × 1012cm-3 and 2 × 1015cm-3 for the MOSFET with p+-implant, is determined down to a distance of a fraction of a μm from the Si-SiO2 interface. The method of extracting the doping profiles is verified using data from a TCAD simulation of the two MOSFETs. The details of the methods and of the problems encountered are discussed.

  15. Photovoltaic properties of ZnO nanorods/p-type Si heterojunction structures

    Directory of Open Access Journals (Sweden)

    Rafal Pietruszka

    2014-02-01

    Full Text Available Selected properties of photovoltaic (PV structures based on n-type zinc oxide nanorods grown by a low temperature hydrothermal method on p-type silicon substrates (100 are investigated. PV structures were covered with thin films of Al doped ZnO grown by atomic layer deposition acting as transparent electrodes. The investigated PV structures differ in terms of the shapes and densities of their nanorods. The best response is observed for the structure containing closely-spaced nanorods, which show light conversion efficiency of 3.6%.

  16. A preliminary review of organic materials single crystal growth by the Czochralski technique

    Science.gov (United States)

    Penn, B. G.; Shields, A. W.; Frazier, D. O.

    1988-01-01

    The growth of single crystals of organic compounds by the Czochralski method is reviewed. From the literature it is found that single crystals of benzil, a nonlinear optical material with a d sub 11 value of 11.2 + or - 1.5 x d sub 11 value of alpha quartz, has fewer dislocations than generally contained in Bridgman crystals. More perfect crystals were grown by repeated Czochralski growth. This consists of etching away the defect-containing portion of a Czochralski grown crystal and using it as a seed for further growth. Other compounds used to grow single crystals are benzophenone, 12-tricosanone (laurone), and salol. The physical properties, growth apparatus, and processing conditions presented in the literature are discussed. Moreover, some of the possible advantages of growing single crystals of organic compounds in microgravity to obtain more perfect crystals than on Earth are reviewed.

  17. Annealing to reduce scattering centers in Czochralski-grown beta-BaB2O4.

    Science.gov (United States)

    Kouta, H; Kuwano, Y

    1999-02-20

    When a visible laser beam passes through beta-BaB(2)O(4) (BBO), scattered light can be observed along the beam within the crystal. Scattering centers caused by structural defects in Czochralski-grown BBO can be reduced by 95% by annealing at 920 degrees C. In the flux-grown BBO, centers actually increase by the same annealing because the process causes microcracks and/or secondary inclusions. It is shown that annealed Czochralski-grown BBO is superior to flux-grown BBO (annealed or as-grown) in terms of optical loss.

  18. P-type electronic and thermal transport properties of Mg2Sn1-xSix

    Science.gov (United States)

    Kim, Sunphil; Wiendlocha, Bartlomiej; Heremans, Joseph P.

    2013-03-01

    P-type Mg2Sn doped with various acceptors(1)(2) has been studied as a potential thermoelectric material. Because of its narrow band gap and high lattice thermal conductivity, the zT values of the binary compound are limited: zTmax reported is 0.3(3). In this work, we synthesize and characterize p-type-doped Mg2Sn1-xSix with various acceptors. Silicon is added in order to widen the band gap and scatter the phonons. The conduction band degeneracy that yields excellent zT in n-type material in the Mg2Sn1-xSix alloy system unfortunately does not apply to p-type material. Thermomagnetic and galvanomagnetic properties (electrical resistivity, Seebeck, Hall, and Nernst coefficients) are measured, along with thermal conductivity and band gap measurements. Finally, zT values are reported. (1) H. Y. Chen et al. Journal of Electronic Materials, Vol. 38, No. 7, 2009 (2) S. Choi et al. Journal of Electronic Materials, Vol. 41, No. 6, 2012 (3) H. Y. Chen et al. Phys. Status Solidi A 207, No. 11, 2523-2531 (2010) The work is supported by the joint NSF/DOE program on thermoelectrics, NSF-CBET-1048622

  19. Performances of miniature microstrip detectors made on oxygen enriched p-type substrates after very high proton irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Casse, G. [Oliver Lodge Laboratory, Department of Physics, University of Liverpool, P.O. Box 147, Liverpool L69 3BX (United Kingdom)]. E-mail: gcasse@hep.ph.liv.ac.uk; Allport, P.P. [Oliver Lodge Laboratory, Department of Physics, University of Liverpool, P.O. Box 147, Liverpool L69 3BX (United Kingdom); Marti i Garcia, S. [IFIC CSIC, Edificio Institutos de Investigacion Apartado de Correos 22085 E-46071, Valencia-Spain (Spain); Lozano, M. [IMB-CNM (CSIC), Campus Universidad Autonoma de Barcelona, 08193 Bellaterra, Barcelona (Spain); Turner, P.R. [Oliver Lodge Laboratory, Department of Physics, University of Liverpool, P.O. Box 147, Liverpool L69 3BX (United Kingdom)

    2004-12-11

    Silicon microstrip detectors with n-type implant read-out strips on FZ p-type bulk (n-in-p) show superior charge collection properties, after heavy irradiation, to the more standard p-strips in n-type silicon (p-in-n). It is also well established that oxygen-enriched n-type silicon substrates show better performance, in terms of degradation of the full depletion voltage after charged hadron irradiation, than the standard FZ silicon used for high energy physics detectors. Silicon microstrip detectors combining both the advantages of oxygenation and of n-strip read-out (n-in-n) have achieved high radiation tolerance to charged hadrons. The manufacturing of n-in-n detectors though requires double-sided processing, resulting in more complicated and expensive devices than standard p-in-n. A cheaper single-sided option, that still combines these advantages, is to use n-in-p devices. P-type FZ wafers have been oxygen-enriched by high temperature diffusion from an oxide layer and successfully used to process miniature (1x1 cm{sup 2}) microstrip detectors. These detectors have been irradiated with 24 GeV/c protons in the CERN/PS T7 irradiation area up to {approx}7.5x10{sup 15} cm{sup -2}. We report results with these irradiated detectors in terms of the charge collection efficiency as a function of the applied bias voltage.

  20. Performances of miniature microstrip detectors made on oxygen enriched p-type substrates after very high proton irradiation

    Science.gov (United States)

    Casse, G.; Allport, P. P.; Martí i Garcia, S.; Lozano, M.; Turner, P. R.

    2004-12-01

    Silicon microstrip detectors with n-type implant read-out strips on FZ p-type bulk (n-in-p) show superior charge collection properties, after heavy irradiation, to the more standard p-strips in n-type silicon (p-in-n). It is also well established that oxygen-enriched n-type silicon substrates show better performance, in terms of degradation of the full depletion voltage after charged hadron irradiation, than the standard FZ silicon used for high energy physics detectors. Silicon microstrip detectors combining both the advantages of oxygenation and of n-strip read-out (n-in-n) have achieved high radiation tolerance to charged hadrons. The manufacturing of n-in-n detectors though requires double-sided processing, resulting in more complicated and expensive devices than standard p-in-n. A cheaper single-sided option, that still combines these advantages, is to use n-in-p devices. P-type FZ wafers have been oxygen-enriched by high temperature diffusion from an oxide layer and succesfully used to process miniature (1×1 cm 2) microstrip detectors. These detectors have been irradiated with 24 GeV/c protons in the CERN/PS T7 irradiation area up to ˜7.5×10 15 cm -2. We report results with these irradiated detectors in terms of the charge collection efficiency as a function of the applied bias voltage.

  1. Influence of Ring Oxidation-Induced Stack Faults on Efficiency in Silicon Solar Cells

    Institute of Scientific and Technical Information of China (English)

    ZHOU Chun-Lan; WANG Wen-Jing; LI Hai-Ling; ZHAO Lei; DIAO Hong-Wei; LI Xu-Dong

    2008-01-01

    @@ We observe a strong correlation between the ring oxidation-induced stack faults (OISF) formed in the course of phosphor diffusion and the efficiency of Czochralski-grown silicon solar cells. The main reason for ring-OISF formation and growth in substrate is the silicon oxidation and phosphorus diffusion process induced silicon self-interstitial point defect during POCl3 diffusion. The decreasing of minority carrier diffusion length in crystal silicon solar cell induced by ring-OISF defects is identified to be one of the major causes of efficiency loss.

  2. Furnace and support equipment for space processing. [space manufacturing - Czochralski method

    Science.gov (United States)

    Mazelsky, R.; Duncan, C. S.; Seidensticker, R. G.; Johnson, R. A.; Hopkins, R. H.; Roland, G. W.

    1975-01-01

    A core facility capable of performing a majority of materials processing experiments is discussed. Experiment classes are described, the needs peculiar to each experiment type are outlined, and projected facility requirements to perform the experiments are treated. Control equipment (automatic control) and variations of the Czochralski method for use in space are discussed.

  3. Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity

    Science.gov (United States)

    Steckenreiter, Verena; Walter, Dominic C.; Schmidt, Jan

    2017-03-01

    Based on contactless carrier lifetime measurements performed on p-type boron-doped Czochralski-grown silicon (Cz-Si) wafers, we examine the rate constant Rde of the permanent deactivation process of the boron-oxygen-related defect center as a function of the illumination intensity I at 170°C. While at low illumination intensities, a linear increase of Rde on I is measured, at high illumination intensities, Rde seems to saturate. We are able to explain the saturation by assuming that Rde increases proportionally with the excess carrier concentration Δ n and take the fact into account that at sufficiently high illumination intensities, the carrier lifetime decreases with increasing Δ n and hence the slope of Δ n (I) decreases, leading to an apparent saturation. Importantly, on low-lifetime Cz-Si samples no saturation of the deactivation rate constant is observed for the same illumination intensities, proving that the deactivation is stimulated by the presence of excess electrons and not directly by the photons.

  4. The Czochralski Growth and Characterization of SrLaGa3O7:Ho(3+) Single Crystals

    Science.gov (United States)

    2001-01-01

    1.5 and 2 at % of Ho3’, respectively were grown by the Czochralski method with use of iridium crucible and afterheater. According to EPMA measurements...The following dopant concentrations were introduced into the charge 0.3, 1.5 and 2 at. %. Single crystals were grown by the Czochralski method with...SrLaGa 30 7 in dependence on temperature. 5. CONCLUSIONS Single crystals of SrLaGa 30 7 doped with holmium were obtained by the Czochralski method . Optical

  5. Al-4(Cr, Fe): single crystal growth by the Czochralski method and structural investigation with neutrons at FRM II

    OpenAIRE

    Bauer, Birgitta; Pedersen, Bjoern; Gille, Peter

    2009-01-01

    A single crystal of Al-4(Cr,Fe) with composition Al78Cr19Fe3 grown bythe Czochralski method was studied by neutron diffraction for the firsttime. As a preliminary result the neutron diffraction experiment

  6. Quasi-perpetual discharge behaviour in p-type Ge-air batteries.

    Science.gov (United States)

    Ocon, Joey D; Kim, Jin Won; Abrenica, Graniel Harne A; Lee, Jae Kwang; Lee, Jaeyoung

    2014-11-07

    Metal-air batteries continue to become attractive energy storage and conversion systems due to their high energy and power densities, safer chemistries, and economic viability. Semiconductor-air batteries - a term we first define here as metal-air batteries that use semiconductor anodes such as silicon (Si) and germanium (Ge) - have been introduced in recent years as new high-energy battery chemistries. In this paper, we describe the excellent doping-dependent discharge kinetics of p-type Ge anodes in a semiconductor-air cell employing a gelled KOH electrolyte. Owing to its Fermi level, n-type Ge is expected to have lower redox potential and better electronic conductivity, which could potentially lead to a higher operating voltage and better discharge kinetics. Nonetheless, discharge measurements demonstrated that this prediction is only valid at the low current regime and breaks down at the high current density region. The p-type Ge behaves extremely better at elevated currents, evident from the higher voltage, more power available, and larger practical energy density from a very long discharge time, possibly arising from the high overpotential for surface passivation. A primary semiconductor-air battery, powered by a flat p-type Ge as a multi-electron anode, exhibited an unprecedented full discharge capacity of 1302.5 mA h gGe(-1) (88% anode utilization efficiency), the highest among semiconductor-air cells, notably better than new metal-air cells with three-dimensional and nanostructured anodes, and at least two folds higher than commercial Zn-air and Al-air cells. We therefore suggest that this study be extended to doped-Si anodes, in order to pave the way for a deeper understanding on the discharge phenomena in alkaline metal-air conversion cells with semiconductor anodes for specific niche applications in the future.

  7. Very low surface recombination velocity on p-type c-Si by high-rate plasma-deposited aluminum oxide

    Science.gov (United States)

    Saint-Cast, Pierre; Kania, Daniel; Hofmann, Marc; Benick, Jan; Rentsch, Jochen; Preu, Ralf

    2009-10-01

    Aluminum oxide layers can provide excellent passivation for lowly and highly doped p-type silicon surfaces. Fixed negative charges induce an accumulation layer at the p-type silicon interface, resulting in very effective field-effect passivation. This paper presents highly negatively charged (Qox=-2.1×1012 cm-2) aluminum oxide layers produced using an inline plasma-enhanced chemical vapor deposition system, leading to very low effective recombination velocities (˜10 cm s-1) on low-resistivity p-type substrates. A minimum static deposition rate (100 nm min-1) at least one order of magnitude higher than atomic layer deposition was achieved on a large carrier surfaces (˜1 m2) without significantly reducing the resultant passivation quality.

  8. KNbO3 single crystal growth by the radio frequency heating Czochralski method

    Science.gov (United States)

    Wang, W.; Zou, Q.; Geng, Z.

    1985-01-01

    A radio frequency heating Czochralski technique to obtain single crystal KNbO3 is first presented. The technological parameters of KNbO3 crystal growth by the Czochralski technique and its pulling conditions were studied in detail. The experiments on second harmonic generation using 1.06 micrometer Nd:YAG laser in KNbO3 have been conducted. The second harmonic efficiency for upconversion of KNbO3 is found to be as high as that of NaBa2Nb5O15. An automatic scanning measurement for the optical homogeneity of KNbO crystal is also described. KNbO3 is revealed to be a potentially useful nonlinear material for optical device applications.

  9. Real time thermal imaging for analysis and control of crystal growth by the Czochralski technique

    Science.gov (United States)

    Wargo, M. J.; Witt, A. F.

    1992-01-01

    A real time thermal imaging system with temperature resolution better than +/- 0.5 C and spatial resolution of better than 0.5 mm has been developed. It has been applied to the analysis of melt surface thermal field distributions in both Czochralski and liquid encapsulated Czochralski growth configurations. The sensor can provide single/multiple point thermal information; a multi-pixel averaging algorithm has been developed which permits localized, low noise sensing and display of optical intensity variations at any location in the hot zone as a function of time. Temperature distributions are measured by extraction of data along a user selectable linear pixel array and are simultaneously displayed, as a graphic overlay, on the thermal image.

  10. Real time thermal imaging for analysis and control of crystal growth by the Czochralski technique

    Science.gov (United States)

    Wargo, M. J.; Witt, A. F.

    1992-01-01

    A real time thermal imaging system with temperature resolution better than +/- 0.5 C and spatial resolution of better than 0.5 mm has been developed. It has been applied to the analysis of melt surface thermal field distributions in both Czochralski and liquid encapsulated Czochralski growth configurations. The sensor can provide single/multiple point thermal information; a multi-pixel averaging algorithm has been developed which permits localized, low noise sensing and display of optical intensity variations at any location in the hot zone as a function of time. Temperature distributions are measured by extraction of data along a user selectable linear pixel array and are simultaneously displayed, as a graphic overlay, on the thermal image.

  11. Continuous Czochralski growth. Development of advanced Czochralski growth process to produce low cost 150 kg silicon ingots from a single crucible for technology readiness

    Science.gov (United States)

    1982-01-01

    The improvement of growth rates using radiation shielding and investigation of the crucible melt interaction for improved yields were emphasized. Growth runs were performed from both 15 and 16 inch diameter crucibles, producing 30 and 37 kg ingots respectively. Efforts to increase the growth rate of 150 mm diameter ingots were limited by temperature instabilities believed to be caused by undesirable thermal convections in the larger melts. The radiation shield improved the growth rate somewhat, but the thermal instability was still evident, leading to nonround ingots and loss of dislocation-free structure. A 38 kg crystal was grown to demonstrate the feasibility of producing 150 kg with four growth cycles. After the grower construction phase, the Hamco microprocessor control system was interfaced to the growth facility, including the sensor for automatic control of seeding temperature, and the sensor for automatic shouldering. Efforts focused upon optimization of the seeding, necking, and shoulder growth automation programs.

  12. Development in p-type Doping of ZnO

    Institute of Scientific and Technical Information of China (English)

    YU Liping; ZHU Qiqiang; FAN Dayong; LAN Zili

    2012-01-01

    Zinc oxide (ZnO) is a wide band-gap material of the Ⅱ-Ⅵ group with excellent optical properties for optoelectronics applications,such as the flat panel displays and solar cells used in sports tournament.Despite its advantages,the application of ZnO is hampered by the lack of stable p-type doping.In this paper,the recent progress in this field was briefly reviewed,and a comprehensive summary of the research was carried out on ZnO fabrication methods and its electrical,optical,and magnetic properties were presented.

  13. P-type conductivity in annealed strontium titanate

    Energy Technology Data Exchange (ETDEWEB)

    Poole, Violet M.; Corolewski, Caleb D.; McCluskey, Matthew D., E-mail: mattmcc@wsu.edu [Department of Physics and Astronomy, Washington State University, Pullman, WA 99164-2814 (United States)

    2015-12-15

    Hall-effect measurements indicate p-type conductivity in bulk, single-crystal strontium titanate (SrTiO{sub 3}, or STO) samples that were annealed at 1200°C. Room-temperature mobilities above 100 cm{sup 2}/V s were measured, an order of magnitude higher than those for electrons (5-10 cm{sup 2}/V s). Average hole densities were in the 10{sup 9}-10{sup 10} cm{sup −3} range, consistent with a deep acceptor.

  14. Bi-Se doped with Cu, p-type semiconductor

    Science.gov (United States)

    Bhattacharya, Raghu Nath; Phok, Sovannary; Parilla, Philip Anthony

    2013-08-20

    A Bi--Se doped with Cu, p-type semiconductor, preferably used as an absorber material in a photovoltaic device. Preferably the semiconductor has at least 20 molar percent Cu. In a preferred embodiment, the semiconductor comprises at least 28 molar percent of Cu. In one embodiment, the semiconductor comprises a molar percentage of Cu and Bi whereby the molar percentage of Cu divided by the molar percentage of Bi is greater than 1.2. In a preferred embodiment, the semiconductor is manufactured as a thin film having a thickness less than 600 nm.

  15. Effect of axial magnetic field on the shape of copper ribbon crystal grown by Czochralski method

    OpenAIRE

    Shen, Zhe; Zhong, Yunbo; Dong, Licheng; FAN, Lijun; Wang, Huai; Li, Chuanjun; Ren, Weili; Lei, Zuosheng; Ren, Zhongming

    2015-01-01

    International audience; During the process of growing ribbon crystal by Czochralski method, Turbulent convection in copper melt was effectively suppressed by applying an axial magnetic field (magnetic induction B≤57mT). The changes of thermal fluctuation and flow field were measured and modeled. With the magnetic field increased gradually (from 0 to 57mT), the shape of ribbon crystal became regularly wider. We concluded that the axial magnetic field could promote to form a suitable temperatur...

  16. Undoped semi-insulating LEC GaAs - A model and a mechanism. [Liquid Encapsulated Czochralski

    Science.gov (United States)

    Oliver, J. R.; Fairman, R. D.; Chen, R. T.; Yu, P. W.

    1981-01-01

    Undoped semi-insulating GaAs grown by the high-pressure liquid encapsulated Czochralski (LEC) method has been produced for use in direct ion implantation in several laboratories. A clear understanding of the factors controlling impurity transport and compensation in these materials has been lacking to date. In this work, detailed characterization has been performed on undoped semi-insulating crystals grown from both SiO2 and PBN crucibles followed by a proposed impurity model and compensation mechanism.

  17. Comparison of LSO samples produced by Czochralsky and modified Musatov methods

    CERN Document Server

    Antich, P; Tsyganov, E N; Garmash, V; Zheleznykh, I

    2000-01-01

    This study is based on test results of 30 LSO samples produced by the POLUS Research Institute in Moscow, Russia, for the University of Texas Southwestern Medical Center at Dallas. Samples were produced by the Czochralsky and the modified Musatov methods. Pulse-height spectra from sup 2 sup 2 Na positron annihilations were analyzed and conclusions are drawn. After some minor corrections to the modified Musatov technology, samples could be recommended for use in PET systems.

  18. Formation of iron disilicide on amorphous silicon

    Science.gov (United States)

    Erlesand, U.; Östling, M.; Bodén, K.

    1991-11-01

    Thin films of iron disilicide, β-FeSi 2 were formed on both amorphous silicon and on crystalline silicon. The β-phase is reported to be semiconducting with a direct band-gap of about 0.85-0.89 eV. This phase is known to form via a nucleation-controlled growth process on crystalline silicon and as a consequence a rather rough silicon/silicide interface is usually formed. In order to improve the interface a bilayer structure of amorphous silicon and iron was sequentially deposited on Czochralski silicon in an e-gun evaporation system. Secondary ion mass spectrometry profiling (SIMS) and scanning electron micrographs revealed an improvement of the interface sharpness. Rutherford backscattering spectrometry (RBS) and X-ray diffractiometry showed β-FeSi 2 formation already at 525°C. It was also observed that the silicide growth was diffusion-controlled, similar to what has been reported for example in the formation of NiSi 2 for the reaction of nickel on amorphous silicon. The kinetics of the FeSi 2 formation in the temperature range 525-625°C was studied by RBS and the activation energy was found to be 1.5 ± 0.1 eV.

  19. Metal Fluoride Inhibition of a P-type H+ Pump

    Science.gov (United States)

    Pedersen, Jesper Torbøl; Falhof, Janus; Ekberg, Kira; Buch-Pedersen, Morten Jeppe; Palmgren, Michael

    2015-01-01

    The plasma membrane H+-ATPase is a P-type ATPase responsible for establishing electrochemical gradients across the plasma membrane in fungi and plants. This essential proton pump exists in two activity states: an autoinhibited basal state with a low turnover rate and a low H+/ATP coupling ratio and an activated state in which ATP hydrolysis is tightly coupled to proton transport. Here we characterize metal fluorides as inhibitors of the fungal enzyme in both states. In contrast to findings for other P-type ATPases, inhibition of the plasma membrane H+-ATPase by metal fluorides was partly reversible, and the stability of the inhibition varied with the activation state. Thus, the stability of the ATPase inhibitor complex decreased significantly when the pump transitioned from the activated to the basal state, particularly when using beryllium fluoride, which mimics the bound phosphate in the E2P conformational state. Taken together, our results indicate that the phosphate bond of the phosphoenzyme intermediate of H+-ATPases is labile in the basal state, which may provide an explanation for the low H+/ATP coupling ratio of these pumps in the basal state. PMID:26134563

  20. Extrinsic doping in silicon revisited

    KAUST Repository

    Schwingenschlögl, Udo

    2010-06-17

    Both n-type and p-type doping of silicon is at odds with the charge transfer predicted by Pauling electronegativities and can only be reconciled if we no longer regarding dopant species as isolated atoms but rather consider them as clusters consisting of the dopant and its four nearest neighbor silicon atoms. The process that gives rise to n-type and p-type effects is the charge redistribution that occurs between the dopant and its neighbors, as we illustrate here using electronic structure calculations. This view point is able to explain why conventional substitutional n-type doping of carbon has been so difficult.

  1. Extrinsic doping in silicon revisited

    Energy Technology Data Exchange (ETDEWEB)

    Schwingenschloegl, Udo [PSE Division, KAUST, Thuwal, Kingdom of Saudi Arabia (Saudi Arabia); Chroneos, Alexander; Grimes, Robin [Department of Materials, Imperial College London, London SW7 2BP (United Kingdom); Schuster, Cosima [Institut fuer Physik, Universitaet Augsburg, 86135 Augsburg (Germany)

    2011-07-01

    Both n-type and p-type doping of silicon is at odds with the charge transfer predicted by Pauling electronegativities and can only be reconciled if we no longer regard dopant species as isolated atoms but rather consider them as clusters consisting of the dopant and its four nearest neighbor silicon atoms. The process that gives rise to n-type and p-type effects is the charge redistribution that occurs between the dopant and its neighbors, as we illustrate here using electronic structure calculations. This view point is able to explain why conventional substitutional n-type doping of carbon has been so difficult.

  2. p-Type NiO Hybrid Visible Photodetector.

    Science.gov (United States)

    Mallows, John; Planells, Miquel; Thakare, Vishal; Bhosale, Reshma; Ogale, Satishchandra; Robertson, Neil

    2015-12-23

    A novel hybrid visible-light photodetector was created using a planar p-type inorganic NiO layer in a junction with an organic electron acceptor layer. The effect of different oxygen pressures on formation of the NiO layer by pulsed laser deposition shows that higher pressure increases the charge carrier density of the film and lowers the dark current in the device. The addition of a monolayer of small molecules containing conjugated π systems and carboxyl groups at the device interface was also investigated and with correct alignment of the energy levels improves the device performance with respect to the quantum efficiency, responsivity, and photogeneration. The thickness of the organic layer was also optimized for the device, giving a responsivity of 1.54 × 10(-2) A W(-1) in 460 nm light.

  3. Elucidating Functional Aspects of P-type ATPases

    DEFF Research Database (Denmark)

    Autzen, Henriette Elisabeth

    2015-01-01

    similar to that of the wild type (WT) protein. The discrepancy between the newly determined crystal structure of LpCopA and the functional manifestations of the missense mutation in human CopA, could indicate that LpCopA is insufficient in structurally elucidating the effect of disease-causing mutations...... cancer and pathogenic microbes. The goal of this Ph.D. dissertation was to functionally characterize SERCA1a and CopA from Legionella pneumophila (LpCopA) through a range of different methods within structural biology. Crystallographic studies of SERCA1a led to a newly determined crystal structure......P-type ATPases are proteins that act to maintain ion homeostasis and electrochemical gradients through the translocation of cations across cell membranes. Underscoring their significance in humans, dysfunction of the ATPases can lead to crucial diseases. Dysfunction of the sarco...

  4. Study on the p-type QWIP-LED device

    Institute of Scientific and Technical Information of China (English)

    ZHEN; Honglou; XIONG; Dayuan; ZHOU; Xuchang; LI; Ning; SHAO; Jun; LU; Wei

    2006-01-01

    A p-type quantum well infrared photodetector (QWIP) integrated with a light-emitting diode (LED) (named QWIP-LED) was fabricated and studied. The infrared photo-response spectrum was obtained from the device resistance variation and the near-infrared photo-emission intensity variation. A good agreement between these two spectra was observed, which demonstrates that the long-wavelength infrared radiation around 7.5 μm has been transferred to the near-infrared light at 0.8 μm by the photo-electronic process in the QWIP-LED structure. Moreover, the experimentally observed infrared response wavelength is in good agreement with the theoretical calculation value of 7.7 μm. The results on the upconversion of the infrared radiation will be very useful for the new infrared focal plane array technology.

  5. Characterization of oxygen dimer-enriched silicon detectors

    CERN Document Server

    Boisvert, V; Moll, M; Murin, L I; Pintilie, I

    2005-01-01

    Various types of silicon material and silicon p+n diodes have been treated to increase the concentration of the oxygen dimer (O2i) defect. This was done by exposing the bulk material and the diodes to 6 MeV electrons at a temperature of about 350 °C. FTIR spectroscopy has been performed on the processed material confirming the formation of oxygen dimer defects in Czochralski silicon pieces. We also show results from TSC characterization on processed diodes. Finally, we investigated the influence of the dimer enrichment process on the depletion voltage of silicon diodes and performed 24 GeV/c proton irradiations to study the evolution of the macroscopic diode characteristics as a function of fluence.

  6. Current status of silicon materials research for photovoltaic applications

    Energy Technology Data Exchange (ETDEWEB)

    Ciszek, T F

    1985-04-01

    The desire for high solar cell efficiencies has been a strong factor in determining the course of recent silicon crystal growth research efforts for photovoltaics. This review, therefore, focuses on single-crystal, dislocation-free ingot growth methods (Czochralski growth, float zoning, and cold crucible growth) and on sheet growth technologies, generally multicrystalline, that have achieved moderately high (>13.5%) laboratory-scale efficiencies. These include dendritic web growth, growth from capillary dies, edge-supported pulling, ribbon-against-drop growth, and a recent technique termed crucible-free horizontal growth. Silicon ribbon crystals provide a favorable geometry and require no wafering, but they contain defects that limit solar cell performance. Growth processes, their current status, and cell efficiencies are discussed. Silicon material process steps before and after crystal growth are described, and the advantages of silicon are presented.

  7. High-resolution photoinduced transient spectroscopy of neutron irradiated bulk silicon

    CERN Document Server

    Kozlowski, R; Nossarzhevska, E

    2002-01-01

    High-resolution photoinduced transient spectroscopy has been employed in a study on the formation of defects in bulk silicon due to 1 MeV neutron irradiation. Apart from divacancies in various charge states, complexes involving interstitial carbon and oxygen were revealed. The defect structure of float zone and Czochralski-grown material exposed to fluences of 2x10 sup 1 sup 4 and 6.75x10 sup 1 sup 4 cm sup - sup 2 is compared.

  8. Effect of production processes on the fracture strength of silicon solar cells

    Science.gov (United States)

    Chen, C. P.; Royal, E. L.; Klink, H.

    1980-01-01

    Fracture of Czochralski silicon wafers during processing is an important factor in solar cell yield and cost. A fracture-mechanics test and analysis program was developed to evaluate fracture strength changes in the in-process wafer-to-cell processing at different stages on a manufacturer's production line. The strength data were described by Weibull statistical analysis and can be interpreted with the surface-flaw distribution of each of the process steps.

  9. The establishment of a production-ready manufacturing process utilizing thin silicon substrates for solar cells

    Science.gov (United States)

    Pryor, R. A.

    1980-01-01

    Three inch diameter Czochralski silicon substrates sliced directly to 5 mil, 8 mil, and 27 mil thicknesses with wire saw techniques were procured. Processing sequences incorporating either diffusion or ion implantation technologies were employed to produce n+p or n+pp+ solar cell structures. These cells were evaluated for performance, ease of fabrication, and cost effectiveness. It was determined that the use of 7 mil or even 4 mil wafers would provide near term cost reductions for solar cell manufacturers.

  10. Photoluminescence study of 1018 meV defect lines from ion-implanted silicon

    CERN Document Server

    Lee, H S; Seong, E Z; Kim, S M; Lim, H J

    1999-01-01

    We investigated the defects of ion-implanted silicon with boron and argon ions using photoluminescence method. The 1018 meV line, so called I sub 1 line, and its phonon side bands were observed in both boron- and argon-implanted silicon crystals. In argon-implanted silicon crystals, we observed 1009 meV line (I sub r - Ar) and its phonon side bands which arose from argon-I sub 1 complex in addition to the splitting of the I sub 1 line. Annealing temperature dependence of the intensities of the I sub 1 and I sub 1 -Ar lines in argon-implanted silicon was very similar for both Czochralski and float zone silicon crystals whereas that of boron-implanted silicon was very different between the two growing methods. We discussed on the origin of the defects responsible for the I sub 1 and I sub 1 - Ar lines.

  11. (Ga,Fe)Sb: A p-type ferromagnetic semiconductor

    Energy Technology Data Exchange (ETDEWEB)

    Tu, Nguyen Thanh; Anh, Le Duc; Tanaka, Masaaki [Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656 (Japan); Hai, Pham Nam [Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656 (Japan); Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo 152-0033 (Japan)

    2014-09-29

    A p-type ferromagnetic semiconductor (Ga{sub 1−x},Fe{sub x})Sb (x = 3.9%–13.7%) has been grown by low-temperature molecular beam epitaxy (MBE) on GaAs(001) substrates. Reflection high energy electron diffraction patterns during the MBE growth and X-ray diffraction spectra indicate that (Ga,Fe)Sb layers have the zinc-blende crystal structure without any other crystallographic phase of precipitates. Magnetic circular dichroism (MCD) spectroscopy characterizations indicate that (Ga,Fe)Sb has the zinc-blende band structure with spin-splitting induced by s,p-d exchange interactions. The magnetic field dependence of the MCD intensity and anomalous Hall resistance of (Ga,Fe)Sb show clear hysteresis, demonstrating the presence of ferromagnetic order. The Curie temperature (T{sub C}) increases with increasing x and reaches 140 K at x = 13.7%. The crystal structure analyses, magneto-transport, and magneto-optical properties indicate that (Ga,Fe)Sb is an intrinsic ferromagnetic semiconductor.

  12. Infrared Transparent Spinel Films with p -Type Conductivity

    Energy Technology Data Exchange (ETDEWEB)

    Windisch, Charles F.; Exarhos, Gregory J.; Ferris, Kim F.; Engelhard, Mark H.; Stewart, Donald C.

    2001-11-29

    Spinel oxide films containing at least two transition metal cations were found to exhibit p-type conductivity with high optical transparency from the visible to wavelengths near 15 micrometers. Resistivities as low as 0.003 ohm-cm were measured on 100 nm thick rf sputter deposited films that contained nickel and cobalt. Optical spectra, Raman scattering and XPS measurements indicated the valency of nickel localized on octahedral sites within the spinel lattice determines these properties. Electronic band structure calculations corroborated the experimental results. A resistivity minimum was found at the composition NiCo2O4 deposited from aqueous or alcoholic solutions followed by subsequent annealing at 400 degrees C in air. Solution deposited films richer in nickel than this stoichiometry always were found to phase separate into nickel oxide and a spinel phase with concomitant loss in conductivity. However, the phase stability region could be extended to higher nickel contents when rf-sputter deposition techniques were used. Sputter deposited spinel films having a nickel to cobalt ratio less than 2 were found to exhibit the highest conductivity. Results suggest that the phase stability region for these materials can be extended through appropriate choice of deposition conditions. A possible mechanism that promotes high conductivity in this system is thought to be charge transfer between the resident di- and trivalent cations that may be assisted by the magnetic nature of the oxide film.

  13. Electronic processes in uniaxially stressed p-type germanium

    Energy Technology Data Exchange (ETDEWEB)

    Dubon, Jr., Oscar Danilo [Univ. of California, Berkeley, CA (United States)

    1996-02-01

    Effect of uniaxial stress on acceptor-related electronic processes in Ge single crystals doped with Ga, Be, and Cu were studied by Hall and photo-Hall effect measurements in conjunction with infrared spectroscopy. Stress dependence of hole lifetime in p-type Ge single crystals is used as a test for competing models of non-radiative capture of holes by acceptors. Photo-Hall effect shows that hole lifetime in Ga- and Be-doped Ge increases by over one order of magnitude with uniaxial stress at liq. He temps. Photo-Hall of Ge:Be shows a stress-induced change in the temperature dependence of hole lifetime. This is consistent with observed increase of responsivity of Ge:Ga detectors with uniaxial stress. Electronic properties of Ge:Cu are shown to change dramatically with uniaxial stress; the results provide a first explanation for the performance of uniaxially stressed, Cu-diffused Ge:Ga detectors which display a high conductivity in absence of photon signal and therefore have poor sensitivity.

  14. Photoconduction spectroscopy of p-type GaSb films

    Energy Technology Data Exchange (ETDEWEB)

    Shura, M.W., E-mail: Megersa.Shura@live.nmmu.ac.za [Department of Physics, P.O. Box 77000, Nelson Mandela Metropolitan University, Port Elizabeth 6031 (South Africa); Wagener, V.; Botha, J.R.; Wagener, M.C. [Department of Physics, P.O. Box 77000, Nelson Mandela Metropolitan University, Port Elizabeth 6031 (South Africa)

    2012-05-15

    Excess carrier lifetimes (77 K) have been measured as function of the absorbed flux density in undoped p-type gallium antimonide films (GaSb/GaAs) using steady state photoconductivity measurements with the illumination wavelength of 1.1 {mu}m. Using the results from Hall effect measurements along with the relations describing the lifetimes of the excess minority carriers in the bulk of the films and at the surface, the theoretical values of the effective excess carrier lifetime in the materials were also calculated. Discrepancies between the experimental and theoretical results were described using a two-layer model, by considering the variation in the charge distribution within the layer due to the presence of surface states, as well as the band offset between the layer and the substrate. Theoretical modeling of the experimental result yields values of different parameters such as band bending at the surface, minimum value of Shockley-Read-Hall lifetime and maximum value of the surface recombination velocity.

  15. Growth of silicon sheets from metallurgical-grade silicon

    Science.gov (United States)

    Ciszek, T.; Schietzelt, M.; Kazmerski, L. L.; Hurd, J. L.; Fernelius, B.

    1981-05-01

    Impure silicon is difficult to solidify in sheet form because of morphological proturberances which may result from constitutional supercooling. Sheet growth methods which require a specific crystallographic orientation or which are characterized by a narrow melt meniscus are most affected by this problem. The edge-supported pulling technique was applied to sheet growth of metallurgical grade silicon and DAR (Direct Arc Reactor) silicon. The 7 mm meniscus height associated with this technique allowed the growth of 5 cm wide sheets from both materials. In each case, the sheets were p-type.

  16. Influence of melt convection on the interface during Czochralski crystal growth

    Science.gov (United States)

    Miller, W.; Rehse, U.; Böttcher, K.

    2000-05-01

    During the growth process of single bulk crystals from melt, the defect density is strongly affected by the shape of the melt/crystal interface. The shape of the interface is governed by the construction of the growth equipment including the heating system and the convection in the melt. In this paper the flow in a GaAs melt and the boron oxide encapsulant in an equipment used for vapour pressure controlled Czochralski growth has been calculated. 2D-axisymmetric calculations have been performed by using the commercial general purpose program FIDAP TM. A simple model has been developed to describe the phase change problem in the weak form.

  17. Flashlamp-pumped Ti:Sapphire laser with different rods grown by Czochralski and Verneuil methods

    Science.gov (United States)

    Boquillon, J. P.; Said, J.

    1992-04-01

    The design and the development of a flashlamp-pumped Ti:Sapphire laser is described. Design criteria are discussed and performance improvements using different types of fluorescent UV converters or filters, such as organic dyes or doped glass are presented. We have tested different laser rods at various Ti-concentrations obtained by Verneuil or Czochralski growth techniques. The maximum laser output energy of 540 mJ with a differential efficiency up to 1% was achieved by using only a pyrex filter surrounding the laser rod.

  18. Czochralski growth of Gd2Ti2O7 single crystals

    Science.gov (United States)

    Guo, F. Y.; Zhang, W. H.; Ruan, M.; Kang, J. B.; Chen, J. Z.

    2014-09-01

    Gd2Ti2O7 (GTO) single crystals having dimensions of 17×17×20 mm3 were grown by the Czochralski method. These crystals displayed a strong growth habit with {1 1 1} facets. The colors of the as-grown crystals were sensitive to the oxygen concentration both during growth and post-growth annealing. The possible reason for the different colors is discussed and based on transmission, energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and electron spin resonance (ESR) analyses.

  19. Effect of pulling direction on resolved shear stress produced in single crystal during Czochralski growth

    Energy Technology Data Exchange (ETDEWEB)

    Iwaki, T.; Kobayashi, N.

    1987-03-01

    The resolved shear stresses (RSSs) in a Czochralski grown fcc single crystal during and after pulling are calculated numerically for various growth directions. The fcc crystal has twelve RSSs of which only five are independent. The total of twelve RSSs, the total of five larger RSSs, and the maximum RSS are obtained to evaluate the contribution of each RSS to dislocation generation or dislocation density. From their cross-sectional patterns, it is found that the <111> growth direction is the most advantageous for the reduction of RSS. Finally, the relation between the cross-sectional patterns of the three RSS measures and some etch-patterns is discussed.

  20. Piezoresistive effect in p-type 3C-SiC at high temperatures characterized using Joule heating.

    Science.gov (United States)

    Phan, Hoang-Phuong; Dinh, Toan; Kozeki, Takahiro; Qamar, Afzaal; Namazu, Takahiro; Dimitrijev, Sima; Nguyen, Nam-Trung; Dao, Dzung Viet

    2016-06-28

    Cubic silicon carbide is a promising material for Micro Electro Mechanical Systems (MEMS) applications in harsh environ-ments and bioapplications thanks to its large band gap, chemical inertness, excellent corrosion tolerance and capability of growth on a Si substrate. This paper reports the piezoresistive effect of p-type single crystalline 3C-SiC characterized at high temperatures, using an in situ measurement method. The experimental results show that the highly doped p-type 3C-SiC possesses a relatively stable gauge factor of approximately 25 to 28 at temperatures varying from 300 K to 573 K. The in situ method proposed in this study also demonstrated that, the combination of the piezoresistive and thermoresistive effects can increase the gauge factor of p-type 3C-SiC to approximately 20% at 573 K. The increase in gauge factor based on the combination of these phenomena could enhance the sensitivity of SiC based MEMS mechanical sensors.

  1. Piezoresistive effect in p-type 3C-SiC at high temperatures characterized using Joule heating

    Science.gov (United States)

    Phan, Hoang-Phuong; Dinh, Toan; Kozeki, Takahiro; Qamar, Afzaal; Namazu, Takahiro; Dimitrijev, Sima; Nguyen, Nam-Trung; Dao, Dzung Viet

    2016-06-01

    Cubic silicon carbide is a promising material for Micro Electro Mechanical Systems (MEMS) applications in harsh environ-ments and bioapplications thanks to its large band gap, chemical inertness, excellent corrosion tolerance and capability of growth on a Si substrate. This paper reports the piezoresistive effect of p-type single crystalline 3C-SiC characterized at high temperatures, using an in situ measurement method. The experimental results show that the highly doped p-type 3C-SiC possesses a relatively stable gauge factor of approximately 25 to 28 at temperatures varying from 300 K to 573 K. The in situ method proposed in this study also demonstrated that, the combination of the piezoresistive and thermoresistive effects can increase the gauge factor of p-type 3C-SiC to approximately 20% at 573 K. The increase in gauge factor based on the combination of these phenomena could enhance the sensitivity of SiC based MEMS mechanical sensors.

  2. Results with p-type pixel sensors with different geometries for the HL-LHC

    Energy Technology Data Exchange (ETDEWEB)

    Allport, P.P. [Department of Physics, University of Liverpool, Oxford Road, Liverpool, L69 7ZE (United Kingdom); Bates, R.; Butter, C. [Department of Physics and Astronomy, University of Glasgow, Glasgow G12 8QQ (United Kingdom); Casse, G. [Department of Physics, University of Liverpool, Oxford Road, Liverpool, L69 7ZE (United Kingdom); Dervan, P.J., E-mail: Paul.Dervan@cern.ch [Department of Physics, University of Liverpool, Oxford Road, Liverpool, L69 7ZE (United Kingdom); Forshaw, D.; Tsurin, I. [Department of Physics, University of Liverpool, Oxford Road, Liverpool, L69 7ZE (United Kingdom)

    2013-12-11

    Pixel detectors will be extensively used for the four innermost layers of the upgraded ATLAS experiment at the future High Luminosity LHC (HL-LHC) at CERN. The total area of pixel sensors will be over 5 m{sup 2}. The silicon sensors that will instrument the pixel volume will have to face several technology challenges. They will have to withstand doses up to 2×10{sup 16} n{sub eq}cm{sup −2}, to have a reduced inactive area at the edge of the sensors still being able to hold 1000 V bias voltage and to be relatively low cost considering the large area to be covered. N-side readout on p-type bulk is the most promising technology for satisfying the various requirements. Several sensor types have been produced in the UK, conceived for various readout systems, for studying the properties of n-in-p and n-in-n sensors before and after irradiation with test beam and laboratory measurements. The status of these studies is presented here.

  3. Orientation Effects in Ballistic High-Strained P-type Si Nanowire FETs

    Directory of Open Access Journals (Sweden)

    Hong Yu

    2009-04-01

    Full Text Available In order to design and optimize high-sensitivity silicon nanowire-field-effect transistor (SiNW FET pressure sensors, this paper investigates the effects of channel orientations and the uniaxial stress on the ballistic hole transport properties of a strongly quantized SiNW FET placed near the high stress regions of the pressure sensors. A discrete stress-dependent six-band k.p method is used for subband structure calculation, coupled to a two-dimensional Poisson solver for electrostatics. A semi-classical ballistic FET model is then used to evaluate the ballistic current-voltage characteristics of SiNW FETs with and without strain. Our results presented here indicate that [110] is the optimum orientation for the p-type SiNW FETs and sensors. For the ultra-scaled 2.2 nm square SiNW, due to the limit of strong quantum confinement, the effect of the uniaxial stress on the magnitude of ballistic drive current is too small to be considered, except for the [100] orientation. However, for larger 5 nm square SiNW transistors with various transport orientations, the uniaxial tensile stress obviously alters the ballistic performance, while the uniaxial compressive stress slightly changes the ballistic hole current. Furthermore, the competition of injection velocity and carrier density related to the effective hole masses is found to play a critical role in determining the performance of the nanotransistors.

  4. Ultraviolet light-emitting diodes with polarization-doped p-type layer

    Science.gov (United States)

    Hu, Wenxiao; Qin, Ping; Song, Weidong; Zhang, Chongzhen; Wang, Rupeng; Zhao, Liangliang; Xia, Chao; Yuan, Songyang; Yin, Yian; Li, Shuti

    2016-09-01

    We report ultraviolet light emitting diode (LEDs) with polarization doped p-type layer. Fabricated LEDs with polarization doped p-type layer exhibited reduced forward voltage and enhanced light output power, compared to those with traditional p-type AlGaN layer. The improvement is attributed to improved hole concentration and the smooth valence band by the polarization enhanced p-type doping. Our simulated results reveal that this p-type layer can further enhance the performance of ultraviolet LEDs by removing the electron blocking layer (EBL).

  5. Engineering piezoresistivity using biaxially strained silicon

    DEFF Research Database (Denmark)

    Pedersen, Jesper Goor; Richter, Jacob; Brandbyge, Mads;

    2008-01-01

    We calculate the shear piezocoefficient of p-type silicon with grown-in biaxial strain using a 66 k·p method. We find a significant increase in the value of the shear piezocoefficient for compressive grown-in biaxial strain, while tensile strain decreases the piezocoefficient. The dependence...... of the piezocoefficient on temperature and dopant density is altered qualitatively for strained silicon. In particular, we find that a vanishing temperature coefficient may result for silicon with grown-in biaxial tensile strain. These results suggest that strained silicon may be used to engineer the iezoresistivity...

  6. Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide

    Directory of Open Access Journals (Sweden)

    Jia Ge

    2014-01-01

    Full Text Available We present an alternative method of depositing a high-quality passivation film for heterojunction silicon wafer solar cells, in this paper. The deposition of hydrogenated intrinsic amorphous silicon suboxide is accomplished by decomposing hydrogen, silane, and carbon dioxide in an industrial remote inductively coupled plasma platform. Through the investigation on CO2 partial pressure and process temperature, excellent surface passivation quality and optical properties are achieved. It is found that the hydrogen content in the film is much higher than what is commonly reported in intrinsic amorphous silicon due to oxygen incorporation. The observed slow depletion of hydrogen with increasing temperature greatly enhances its process window as well. The effective lifetime of symmetrically passivated samples under the optimal condition exceeds 4.7 ms on planar n-type Czochralski silicon wafers with a resistivity of 1 Ωcm, which is equivalent to an effective surface recombination velocity of less than 1.7 cms−1 and an implied open-circuit voltage (Voc of 741 mV. A comparison with several high quality passivation schemes for solar cells reveals that the developed inductively coupled plasma deposited films show excellent passivation quality. The excellent optical property and resistance to degradation make it an excellent substitute for industrial heterojunction silicon solar cell production.

  7. Fabrication and simulation of single crystal p-type Si nanowire using SOI technology

    Energy Technology Data Exchange (ETDEWEB)

    Dehzangi, Arash, E-mail: arashd53@hotmail.com [Institute of Microengineering and Nanoelectronics (IMEN), Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Larki, Farhad [Institute of Microengineering and Nanoelectronics (IMEN), Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Naseri, Mahmud G. [Department of Physics, Faculty of Science, Malayer University, Malayer, Hamedan (Iran, Islamic Republic of); Navasery, Manizheh [Department of Physics, Faculty of Science, Universiti Putra Malaysia, 43400 Serdang, Selangor (Malaysia); Majlis, Burhanuddin Y.; Razip Wee, Mohd F. [Institute of Microengineering and Nanoelectronics (IMEN), Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Halimah, M.K. [Department of Physics, Faculty of Science, Universiti Putra Malaysia, 43400 Serdang, Selangor (Malaysia); Islam, Md. Shabiul; Md Ali, Sawal H. [Institute of Microengineering and Nanoelectronics (IMEN), Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Saion, Elias [Department of Physics, Faculty of Science, Universiti Putra Malaysia, 43400 Serdang, Selangor (Malaysia)

    2015-04-15

    Highlights: • Single crystal silicon nanowire is fabricated on Si on insulator substrate, using atomic force microscope (AFM) nanolithography and KOH + IPA chemical wet etching. • Some of major parameters in fabrication process, such as writing speed and applied voltage along with KOH etching depth are investigated, and then the I–V characteristic of Si nanowires is measured. • For better understanding of the charge transmission through the nanowire, 3D-TCAD simulation is performed to simulate the Si nanowires with the same size of the fabricated ones, and variation of majority and minority carriers, hole quasi-Fermi level and generation/recombination rate are investigated. - Abstract: Si nanowires (SiNWs) as building blocks for nanostructured materials and nanoelectronics have attracted much attention due to their major role in device fabrication. In the present work a top-down fabrication approach as atomic force microscope (AFM) nanolithography was performed on Si on insulator (SOI) substrate to fabricate a single crystal p-type SiNW. To draw oxide patterns on top of the SOI substrate local anodic oxidation was carried out by AFM in contact mode. After the oxidation procedure, an optimized solution of 30 wt.% KOH with 10 vol.% IPA for wet etching at 63 °C was applied to extract the nanostructure. The fabricated SiNW had 70–85 nm full width at half maximum width, 90 nm thickness and 4 μm length. The SiNW was simulated using Sentaurus 3D software with the exact same size of the fabricated device. I–V characterization of the SiNW was measured and compared with simulation results. Using simulation results variation of carrier's concentrations, valence band edge energy and recombination generation rate for different applied voltage were investigated.

  8. Control of parabolic PDEs with time-varying spatial domain: Czochralski crystal growth process

    Science.gov (United States)

    Ng, James; Aksikas, Ilyasse; Dubljevic, Stevan

    2013-09-01

    This paper considers the optimal control problem for a class of convection-diffusion-reaction systems modelled by partial differential equations (PDEs) defined on time-varying spatial domains. The class of PDEs is characterised by the presence of a time-dependent convective-transport term which is associated with the time evolution of the spatial domain boundary. The functional analytic description of the PDE yields the representation of the initial and boundary value problem as a nonautonomous parabolic evolution equation on an appropriately defined infinite-dimensional function space. The properties of the time-varying evolution operator to guarantee existence and well posedness of the initial and boundary value problem are demonstrated which serves as the basis for the optimal control problem synthesis. An industrial application of the crystal temperature regulation problem for the Czochralski crystal growth process is considered and numerical simulation results are provided.

  9. Growth of 2-amino-5-chlorobenzophenone single crystal by Microtube Czochralski method and its characterization

    Indian Academy of Sciences (India)

    R Govindaraj; M Magesh; P Ramasamy

    2015-02-01

    Organic single crystals of 2-amino-5-chlorobenzophenone (2A5CB) were grown by Microtube Czochralski method using Microtube as a seed. The grown crystals were characterized by single crystal and powder X-ray diffraction. The functional groups of the grown crystal were found using Fourier transform infrared spectroscopy. The cutoff wavelength of 2A5CB has been identified using UV–vis–NIR studies. Thermogravimetric/differential thermal analysis (TG/DTA) has been carried out to find the thermal behaviour. 2A5CB was found to be thermally stable up to 125°C. Powder second harmonic generation (SHG) was investigated to explore its nonlinear optical (NLO) properties. The mechanical stability of 2A5CB is studied by using Vickers hardness testing.

  10. Single crystal growth of Ga3Ni2 by the Czochralski method

    Science.gov (United States)

    Wencka, Magdalena; Pillaca, Mirtha; Gille, Peter

    2016-09-01

    Intermetallic compounds have proved to be interesting alternatives to heterogeneous catalysts prepared from pure noble metals or their alloys. As to study their intrinsic properties, to determine the crystalline structures of specific surfaces and finally to understand elementary processes of heterogeneous catalysis, single crystals of these intermetallics are needed. Inspired by the recent discovery of Ga-Ni catalysts for carbon dioxide reduction to methanol, we have grown for the first time cm3-size single crystals of trigonal Ga3Ni2. We report in detail on the synthesis and Czochralski growth from high-temperature solution using Ga as native solvent. Inclusion formation of Ga-rich fluid proved to be the most severe problem that was minimized by using an extremely low pulling rate down to 25 μm/h.

  11. Numerical investigation of flows in Czochralski crystal growth by an axisymmetric lattice Boltzmann method

    CERN Document Server

    Peng, Y; Chew, Y T; Qiu, J

    2003-01-01

    An alternative new method called lattice Boltzmann method (LBM) is applied in this work to simulate the flows in Czochralski crystal growth, which is one of the widely used prototypical systems for melt-crystal growth. The standard LBM can only be used in Cartesian coordinate system and we extend it to be applicable to this axisymmetric thermal flow problem, avoiding the use of three-dimensional LBM on Cartesian coordinate system. The extension is based on the following idea. By inserting position and time dependent source terms into the evolution equation of standard LBM, the continuity and NS equations on the cylindrical coordinate system can be recovered. Our extension is validated by its application to the benchmark problem suggested by Wheeler .

  12. Dislocation structure of Ge crystals grown by low thermal gradient Czochralski technique

    Science.gov (United States)

    Trukhanov, E. M.; Fritzler, K. B.; Vasilenko, A. P.; Kolesnikov, A. V.; Kasimkin, P. V.; Moskovskih, V. A.

    2017-06-01

    Dislocation structure of the Ge single crystals grown by Czochralski method with low thermal gradient has been studied. The selective etching technique and the X-Ray transmission and reflection topography were used. Clearly defined non-uniform dislocation distribution over the crystal cross - section is revealed. Helical dislocations and sets of prismatic dislocation loops are registered. Helical dislocations perpendicular to the ingot axis are situated near the boundary between the regions with low and high dislocation densities (102 and 103 cm-2, respectively). Their length can be as much as several millimeters. Dislocation formations lying at a 35.3° to the crystal axis along directions are also observed. These formations have the shape of prism confined by {111} planes.

  13. Optical Properties of LiNbO3 Single Crystal Grown by Czochralski Method

    Science.gov (United States)

    Sahar, M. R.; Naim, N. M.; Hamzah, K.

    2011-03-01

    Pure LiNbO3 single crystal was grown by Czochralski method using Automatic Diameter Control—Crystal Growth System (ADC-CGS). The transmission spectrum was determined by using Infrared Spectroscopy while the refractive index was determined using UV-Vis spectroscopy via the Sellmeier equation. The density was also measured using the Archimedes principle. It was found that the peak for the absorption vibrational spectrum for LiNbO3 crystal occurs at 801 cm-1, 672 cm-1, 639 cm-1 and 435 cm-1. The refractive index, ne was found to be 2.480 and the crystal density was around 4.64 g/cm3.

  14. Compensation mechanism in liquid encapsulated Czochralski GaAs Importance of melt stoichiometry

    Science.gov (United States)

    Holmes, D. E.; Chen, R. T.; Elliott, K. R.; Kirkpatrick, C. G.; Yu, P. W.

    1982-01-01

    It is shown that the key to reproducible growth of undoped semi-insulating GaAs by the liquid encapsulated Czochralski (LEC) technique is the control over the melt stoichiometry. Twelve crystals were grown from stoichiometric and nonstoichiometric melts. The material was characterized by secondary ion mass spectrometry, localized vibrational mode far infrared spectroscopy, Hall-effect measurements, optical absorption, and photoluminescence. A quantitative model for the compensation mechanism in the semi-insulating material was developed based on these measurements. The free carrier concentration is controlled by the balance between EL2 deep donors and carbon acceptors; furthermore, the incorporation of EL2 is controlled by the melt stoichiometry, increasing as the As atom fraction in the melt increases. As a result, semi-insulating material can be grown only from melts above a critical As composition. The practical significance of these results is discussed in terms of achieving high yield and reproducibility in the crystal growth process.

  15. Flow Instability of Molten GaAs in the Czochralski Configuration

    Institute of Scientific and Technical Information of China (English)

    Shuxian CHEN; Mingwei LI

    2007-01-01

    The flow and heat transfer of molten GaAs under the interaction of buoyancy, Marangoni and crystal rotation in the Czochralski configuration are numerically studied by using a time-dependent and three-dimensional turbulent flow model for the first time. The transition from axisymmetric flow to non-axisymmetric flow and then returning to axisymmetric flow again with increasing centrifugal and coriolis forces by increasing the crystal rotation rate was numerically observed. The origin of the transition to non-axisymmetric flow has been proved to be baroclinic instability. Several important characteristics of baroclinic instability in the CZ GaAs melt have been predicted. These characteristics are found to be in agreement with experimental observations.

  16. Continuous Czochralski Growth. Silicon Sheet Growth Development of the Large Area Silicon Sheet Task of the Low Cost Silicon Solar Array Project

    Science.gov (United States)

    Merz, F.

    1979-01-01

    During the reporting period, a successful 100 kilogram run was performed. Six ingots of 13 cm diameter were grown, ranging in size from 15.5 kg to 17.7 kg. Melt replenishment methods included both poly rod and lump feed material. Samples from each ingot were prepared for solar cell fabrication and analyses, impurity analysis, and structural studies. The furnace was converted to the 14-inch hot zone and preliminary heat runs were performed. Two sucessful runs were demonstrated, by growing 25 kg ingots from 30 kg melts. Also, a 100 kg run was attempted, utilizing the 14 inch crucible hot zone, but was prematurely terminated due to excessive monoxide which accumulated on the viewports and a seed failure.

  17. Segregation of Ge in B and Ge codoped Czochralski-Si crystal growth

    Energy Technology Data Exchange (ETDEWEB)

    Arivanandhan, Mukannan, E-mail: rmarivu@ipc.shizuoka.ac.jp [Department of Electronics and Materials Science, Graduate School of Engineering, Shizuoka University, Johoku 3-5-1, Naka-Ku, Hamamatsu 432-8011 (Japan); Research Institute of Electronics, Shizuoka University, Johoku 3-5-1, Naka-Ku, Hamamatsu 432-8011 (Japan); Gotoh, Raira; Fujiwara, Kozo; Uda, Satoshi [Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan); Hayakawa, Yasuhiro [Department of Electronics and Materials Science, Graduate School of Engineering, Shizuoka University, Johoku 3-5-1, Naka-Ku, Hamamatsu 432-8011 (Japan); Research Institute of Electronics, Shizuoka University, Johoku 3-5-1, Naka-Ku, Hamamatsu 432-8011 (Japan)

    2015-08-05

    Highlights: • Effective segregation of Ge in B and Ge codoped Czochralski-Si crystal growth was analyzed. • The equilibrium segregation coefficient of Ge was calculated. • The experimentally results were analytically analyzed using partitioning theory. - Abstract: The segregation of Ge in B and Ge codoped Czochralski (CZ)-Si crystal growth was investigated. The concentration of Ge in heavily Ge codoped CZ-Si was measured by electron probe micro analysis (EPMA) and X-ray fluorescence spectroscopy. The effective segregation coefficient of Ge (k{sub eff}) was calculated by fitting the EPMA data to the normal freezing equation, and by taking the logarithmic ratio of the Ge concentrations at the seed and tail of the ingots (top to bottom approach). The k{sub eff} of Ge increased from 0.30 to 0.55, when the initial Ge concentration in the Si melt (C{sub L(o)}{sup Ge}) was increased from 3 × 10{sup 19} to 3 × 10{sup 21} cm{sup −3}. To avoid cellular growth, the crystal pulling rate was decreased for heavily Ge codoped crystal growth (C{sub L(o)}{sup Ge} > 3 × 10{sup 20} cm{sup −3}). The equilibrium segregation coefficient (k{sub 0}) of Ge was calculated by partitioning theory, and was smaller than the experimentally estimated k{sub eff}. The variation of k{sub eff} from k{sub 0} was discussed based on Ge clustering in the heavily Ge codoped crystal, which led to changes in the bonding and strain energies caused by the incorporation of Ge into Si.

  18. Energy and angular anisotropy optimisation of a p-type diode for in vivo dosimetry in photon-beam radiotherapy.

    Science.gov (United States)

    Greene, Simon; Price, Robert A

    2005-01-01

    We present simulation work using the Monte Carlo code MCNPX that shows that there is a possibility of improving the silicon p-type diode as a radiation dosemeter, by altering the construction of the diode. Altering the diode die thickness can reduce the inherent angular anisotropy of the diode, with little effect on its energy response. Conversely, the contact material and geometry have a large impact on the energy response with little effect on the inherent angular anisotropy. By correct choice of contact material, the typical over-response -100 keV relative to the response at 60Co energy can be reduced from approximately 20 to 4. It is expected that further enhancements may be made with different geometries and materials.

  19. Dendritic web silicon for solar cell application

    Science.gov (United States)

    Seidensticker, R. G.

    1977-01-01

    The dendritic web process for growing long thin ribbon crystals of silicon and other semiconductors is described. Growth is initiated from a thin wirelike dendrite seed which is brought into contact with the melt surface. Initially, the seed grows laterally to form a button at the melt surface; when the seed is withdrawn, needlelike dendrites propagate from each end of the button into the melt, and the web portion of the crystal is formed by the solidification of the liquid film supported by the button and the bounding dendrites. Apparatus used for dendritic web growth, material characteristics, and the two distinctly different mechanisms involved in the growth of a single crystal are examined. The performance of solar cells fabricated from dendritic web material is indistinguishable from the performance of cells fabricated from Czochralski grown material.

  20. Proton irradiation effects in silicon devices

    Energy Technology Data Exchange (ETDEWEB)

    Simoen, E.; Vanhellemont, J.; Alaerts, A. [IMEC, Leuven (Belgium)] [and others

    1997-03-01

    Proton irradiation effects in silicon devices are studied for components fabricated in various substrates in order to reveal possible hardening effects. The degradation of p-n junction diodes increases in first order proportionally with the fluence, when submitted to 10 MeV proton irradiations in the range 5x10{sup 9} cm{sup -2} to 5x10{sup 11} cm{sup -2}. The damage coefficients for both p- and n-type Czochralski, Float-Zone and epitaxial wafers are reported. Charge-Coupled Devices fabricated in a 1.2 {mu}m CCD-CMOS technology are shown to be quite resistant to 59 MeV H{sup +} irradiations, irrespective of the substrate type. (author)

  1. Radiation Damage in Silicon Detectors Caused by Hadronic and Electromagnetic Irradiation

    CERN Document Server

    Fretwurst, E.; Stahl, J.; Pintilie, I.

    2002-01-01

    The report contains various aspects of radiation damage in silicon detectors subjected to high intensity hadron and electromagnetic irradiation. It focuses on improvements for the foreseen LHC applications, employing oxygenation of silicon wafers during detector processing (result from CERN-RD48). An updated survey on hadron induced damage is given in the first article. Several improvements are outlined especially with respect to antiannealing problems associated with detector storage during LHC maintenance periods. Open questions are outlined in the final section, among which are a full understanding of differences found between proton and neutron induced damage, process related effects changing the radiation tolerance in addition to the oxygen content and the lack of understanding the changed detector properties on the basis of damage induced point and cluster defects. In addition to float zone silicon, so far entirely used for detector fabrication,Czochralski silicon was also studied and first promising re...

  2. Superhydrophobic Porous Silicon Surfaces

    Directory of Open Access Journals (Sweden)

    Paolo NENZI

    2011-12-01

    Full Text Available In this paper, we present an inexpensive technique to produce superhydrophobic surfaces from porous silicon. Superhydrophobic surfaces are a key technology for their ability to reduce friction losses in microchannels and their self cleaning properties. The morphology of a p-type silicon wafer is modified by a electrochemical wet etch to produce pores with controlled size and distribution and coated with a silane hydrophobic layer. Surface morphology is characterized by means of scanning electron microscope images. Large contact angles are observed on such surfaces and the results are compared with classical wetting models (Cassie and Wenzel suggesting a mixed Wenzel-Cassie behavior. The presented technique represents a cost-effective means for friction reduction in microfluidic applications, such as lab-on-a-chip.

  3. Establishment of a production-ready manufacturing process utilizing thin silicon substrates for solar cells. Final report. Motorola report No. 2364/4

    Energy Technology Data Exchange (ETDEWEB)

    Pryor, R. A.

    1980-10-01

    Three inch diameter Czochralski silicon substrates sliced directly to 5 mil, 8 mil, and 27 mil thicknesses with wire saw techniques were procured. Processing sequences incorporating either diffusion or ion implantation technologies were employed to produce n+p or n+pp+ solar cell structures. These cells were evaluated for performance, ease of fabrication, and cost effectiveness. It was determined that the use of 7 mil or even 4 mil wafers would provide near term cost reductions for solar cell manufacturers.

  4. Investigating reliability attributes of silicon photovoltaic cells - An overview

    Science.gov (United States)

    Royal, E. L.

    1982-01-01

    Reliability attributes are being developed on a wide variety of advanced single-crystal silicon solar cells. Two separate investigations: cell-contact integrity (metal-to-silicon adherence), and cracked cells identified with fracture-strength-reducing flaws are discussed. In the cell-contact-integrity investigation, analysis of contact pull-strength data shows that cell types made with different metallization technologies, i.e., vacuum, plated, screen-printed and soldered, have appreciably different reliability attributes. In the second investigation, fracture strength was measured using Czochralski wafers and cells taken at various stages of processing and differences were noted. Fracture strength, which is believed to be governed by flaws introduced during wafer sawing, was observed to improve (increase) after chemical polishing and other process steps that tend to remove surface and edge flaws.

  5. A novel mechanism of P-type ATPase autoinhibition involving both termini of the protein

    DEFF Research Database (Denmark)

    Ekberg, Kira; Palmgren, Michael; Veierskov, Bjarke;

    2010-01-01

    The activity of many P-type ATPases is found to be regulated by interacting proteins or autoinhibitory elements located in N- or C-terminal extensions. An extended C terminus of fungal and plant P-type plasma membrane H+-ATPases has long been recognized to be part of a regulatory apparatus...

  6. Demethoxycurcumin is a potent inhibitor of P-type ATPases from diverse kingdoms of life

    DEFF Research Database (Denmark)

    Dao, Trong Tuan; Sehgal, Pankaj; Thanh Tung, Truong;

    2016-01-01

    P-type ATPases catalyze the active transport of cations and phospholipids across biological membranes. Members of this large family are involved in a range of fundamental cellular processes. To date, a substantial number of P-type ATPase inhibitors have been characterized, some of which are used ...

  7. Luminance behavior of lithium-doped ZnO nanowires with p-type conduction characteristics.

    Science.gov (United States)

    Ko, Won Bae; Lee, Jun Seok; Lee, Sang Hyo; Cha, Seung Nam; Sohn, Jung Inn; Kim, Jong Min; Park, Young Jun; Kim, Hyun Jung; Hong, Jin Pyo

    2013-09-01

    The present study describes the room-temperature cathodeluminescence (CL) and temperature-dependent photoluminescence (PL) properties of p-type lithium (Li)-doped zinc oxide (ZnO) nanowires (NWs) grown by hydrothermal doping and post-annealing processes. A ZnO thin film was used as a seed layer in NW growth. The emission wavelengths and intensities of undoped ZnO NWs and p-type Li-doped ZnO NWs were analyzed for comparison. CL and PL observations of post-annealed p-type Li-doped ZnO NWs clearly exhibited a dominant sharp band-edge emission. Finally, a n-type ZnO thin film/p-type annealed Li-doped ZnO NW homojunction diode was prepared to confirm the p-type conduction of annealed Li-doped ZnO NWs as well as the structural properties measured by transmission electron microscopy.

  8. Silicon Materials Task of the Low Cost Solar Array Project (Phase II). Effect of impurities and processing on silicon solar cells. Phase II. Summary and eleventh quarterly report

    Energy Technology Data Exchange (ETDEWEB)

    Hopkins, R.H.; Davis, J.R.; Blais, P.D.; Rohatgi, A.; Rai-Choudhury, P.; Hanes, M.H.; McCormick, J.R.

    1978-07-01

    The effects of various processes, metal contaminants and contaminant-process interactions on the performance of terrestrial silicon solar cells were investigated. A variety of aspects including thermal treatments, crystal growth rate, base doping concentration (low resistivity), base doping type (n vs. p), grain boundary structure, and carbon/oxygen-metal interactions (float zone vs Czochralski growth) were studied. The effects of various metallic impurities were studied, introduced singly or in combination into Czochralski, float zone and polycrystalline silicon ingots and into silicon ribbons grown by the dendritic web process. The totality of the solar cell data (comprising over 4000 cells) indicate that impurity-induced performance loss is primarily due to reduction in base diffusion length. Based on this assumption an analytical model has been developed which predicts cell performance as a function of metal impurity content. The model has now been verified for p-base material by correlating the projected and measured performance of solar cells made on 19 ingots bearing multiple impurities.

  9. Comparison of junctionless and inversion-mode p-type metal-oxide-semiconductor field-effect transistors in presence of hole-phonon interactions

    Energy Technology Data Exchange (ETDEWEB)

    Dib, E., E-mail: elias.dib@for.unipi.it [Dipartimento di Ingegneria dell' Informazione, Università di Pisa, 56122 Pisa (Italy); Carrillo-Nuñez, H. [Integrated Systems Laboratory ETH Zürich, Gloriastrasse 35, 8092 Zürich (Switzerland); Cavassilas, N.; Bescond, M. [IM2NP, UMR CNRS 6242, Bât. IRPHE, Technopôle de Château-Gombert, 13384 Marseille Cedex 13 (France)

    2016-01-28

    Junctionless transistors are being considered as one of the alternatives to conventional metal-oxide field-effect transistors. In this work, it is then presented a simulation study of silicon double-gated p-type junctionless transistors compared with its inversion-mode counterpart. The quantum transport problem is solved within the non-equilibrium Green's function formalism, whereas hole-phonon interactions are tackled by means of the self-consistent Born approximation. Our findings show that junctionless transistors should perform as good as a conventional transistor only for ultra-thin channels, with the disadvantage of requiring higher supply voltages in thicker channel configurations.

  10. Laser characterisation of a 3D single-type column p-type prototype module read out with ATLAS SCT electronics

    Energy Technology Data Exchange (ETDEWEB)

    Ehrich, T. [Physikalisches Institut, Universitaet Freiburg, Hermann-Herder Str. 3, 79104 Freiburg (Germany); Kuehn, S. [Physikalisches Institut, Universitaet Freiburg, Hermann-Herder Str. 3, 79104 Freiburg (Germany)], E-mail: susanne.kuehn@physik.uni-freiburg.de; Boscardin, M.; Dalla Betta, G.-F. [ITC-irst Trento, Microsystems Division, via Sommarive, 18 38050 Povo di Trento (Italy); Eckert, S.; Jakobs, K.; Maassen, M.; Parzefall, U. [Physikalisches Institut, Universitaet Freiburg, Hermann-Herder Str. 3, 79104 Freiburg (Germany); Piemonte, C.; Pozza, A.; Ronchin, S.; Zorzi, N. [ITC-irst Trento, Microsystems Division, via Sommarive, 18 38050 Povo di Trento (Italy)

    2007-12-11

    In this paper measurements of a 3D single-type column (3D-stc) microstrip silicon device are shown. The 3D-stc sensor has n-type columns in p-type substrate. It has been connected to an ATLAS SCT ABCD3T chip and is readout with ATLAS SCT electronics at 40 MHz. Spatial measurements were done with a laser setup to investigate the expected low field region in 3D devices. An influence of the p-stops on the collected charge has been observed.

  11. Light and current induced degradation in p-type multi-crystalline cells and development of an inspection method and a stabilization method

    Energy Technology Data Exchange (ETDEWEB)

    Broek, K.M.; Bennett, I.J.; Jansen, M.J.; Borg, Van der N.J.C.M.; Eerenstein, W. [ECN Solar Energy, Petten (Netherlands)

    2012-09-15

    Stable solar cells are needed for durability testing of different combinations of module materials. In such a test, significant power losses in full-size modules with multi-crystalline cells after thermal cycling have been observed. This has been related to degradation of the solar cells used and it appeared that this was caused by current induced degradation. This phenomenon is not limited to boron doped Cz-Si, but can also occur in p-type multi-crystalline silicon. Work was done to develop an incoming inspection method for new batches of cells. Also, stabilisation procedures for modules containing cells that are sensitive to degradation have been determined.

  12. The Fabrication, Microstructural Characterization, and Internal Photoresponse of Platinum Silicide/P-Type Silicon and Iridium Silicide/P-Type Silicon Schottky Barrier Photodetectors for Infrared Focal Plane Arrays

    Science.gov (United States)

    1991-10-01

    34)H(hv-20)X (r(I)+J/~+/ ~ jh ) D ~ ~ k/ (d Id______jrh+ X si /Y Po(X cos(fTtx’)dX (3.46) sin rd) 0 Poe where Pog represents the total number of carriers...that Cd/D o 1, so that Ym will be well estimated by the formula jhv -2\\ 2d I(Crh)] 2 H(hv-20) (3.47) In contrast to the normal photoyield expressions, Eq

  13. Simulation of the temperature distribution in crystals grown by Czochralski method

    Science.gov (United States)

    Dudokovic, M. P.; Ramachandran, P. A.

    1985-01-01

    Production of perfect crystals, free of residual strain and dislocations and with prescribed dopant concentration, by the Czochralski method is possible only if the complex, interacting phenomena that affect crystal growth in a Cz-puller are fully understood and quantified. Natural and forced convection in the melt, thermocapillary effect and heat transfer in and around the crystal affect its growth rate, the shape of the crystal-melt interface and the temperature gradients in the crystal. The heat transfer problem in the crystal and between the crystal and all other surfaces present in the crystal pulling apparatus are discussed at length. A simulation and computer algorithm are used, based on the following assumptions: (1) only conduction occurs in the crystal (experimentally determined conductivity as a function of temperature is used), (2) melt temperature and the melt-crystal heat transfer coefficient are available (either as constant values or functions of radial position), (3) pseudo-steady state is achieved with respect to temperature gradients, (4) crystal radius is fixed, and (5) both direct and reflected radiation exchange occurs among all surfaces at various temperatures in the crystal puller enclosure.

  14. Continuous replenishment of molten semiconductor in a Czochralski-process, single-crystal-growing furnace

    Science.gov (United States)

    Fiegl, George (Inventor); Torbet, Walter (Inventor)

    1981-01-01

    A replenishment crucible is mounted adjacent the usual drawing crucible, from which a monocrystalline boule is drawn according to the Czochralski method. A siphon tube for molten semiconductor transfer extends from the replenishment crucible to the drawing crucible. Each crucible is enclosed within its own hermetic shell and is provided with its own heater. The siphon tube is initially filled with molten semiconductor by raising the inert atmospheric pressure in the shell surrounding the replenishment crucible above that surrounding the drawing crucible. Thereafter, adjustment of the level of molten semiconductor in the drawing crucible may be achieved by adjusting the level in either crucible, since the siphon tube will establish the same level in both crucibles. For continuous processing, solid semiconductor may be added to and melted in the replenishment crucible during the process of drawing crystals from the drawing crucible. A constant liquid level of melted semiconductor is maintained in the system by an optical monitoring device and any of several electromechanical controls of the rate of replenishment or crucible height.

  15. In-situ detection of growth striations by crystallization electromotive force measurement during Czochralski crystal growth

    Science.gov (United States)

    Zhu, Yunzhong; Ma, Decai; Long, Siwei; Tang, Feng; Lin, Shaopeng; Wang, Biao

    2017-10-01

    Growth striations, as macrodefects of crystalline materials, are mainly caused by convection and temperature fluctuations in growth interface. For decades, striations have been widely regarded as an inherent problem. Even in the well-developed Czochralski method, the striation formation process is difficult to inspect in situ. In view of this long-standing issue, after systematically studying the temperature, weight, and output power during crystal growth and numerically modeling the growth process, we found that the regularity of the growth interface electromotive force (GEMF) is related to the distribution of striations. Furthermore, the GEMF quantifies interface fluctuations (711.2 s, 16.6 μm) and thermal hysteresis (107 s), presenting finer details than those provided by a thermocouple and a load cell. In this paper, GEMF is found to be an outstanding choice for monitoring the crystal growth status in real time. As an additional feedback, a new automatic control method could be developed for reducing growth striations and promoting crystal quality.

  16. Czochralski growth and characterization of MgAl2O4 single crystals

    Science.gov (United States)

    Bajor, Andrzej L.; Chmielewski, Marcin; Diduszko, Ryszard; Kisielewski, Jaroslaw; Lukasiewicz, Tadeusz; Orlinski, Krzysztof; Romaniec, Magdalena; Szyrski, Wlodzimierz

    2014-09-01

    MgAl2O4 (MALO) single crystals were pulled by the Czochralski method in [111] direction. The crystals were doped with Co (0.06-0.6 at% (charge compositions)), because Co2+ ions in tetrahedral positions exhibit non-linear optical properties, and, currently, Co:MALO seems to be the best saturable absorber in the eye-safe region (ca. 1.5 μm). By XRD powder technique a stoichiometric MALO was evidenced without admixtures of higher order spinels (MgAl4O7 and MgAl6O10). Also no excessive residual stresses have been discovered by different optical methods, and irrespective of the doping level we did not face any problem of cracking when cutting the crystals into wafers and other structures. In this work we have concentrated our efforts on investigation of thermal properties of MALO. Due to the 2nd order phase transition ca. 650 °C they seem to be of crucial importance in future thermal bonding of this material to the lasing host (Yb,Er-glass) expected just about this temperature.

  17. Crystal-melt interface shape of Czochralski-grown large diameter germanium crystals

    Science.gov (United States)

    Roth, M.; Azoulay, M.; Gafni, G.; Mizrachi, M.

    1990-01-01

    Crystal-melt interface shapes of 100 to 200 mm diameter 111-line Ge grown by the Czochralski technique have been examined using the method of fast withdrawal from the melt. Initially, the interface shape is convex, then transforms gradually into a sigmoidal shape, becomes nearly planar at about one third of the final crystal length, and finally assumes a concave profile with progressively increasing curvature. The nearly planar interface has a double-facet structure, with an annular facet at the edge of the crystal in addition to the central (111) facet. Formation of the annular facet is accompanied by a giant oscillation of the pull rate when the maximum average pull rate is exceeded. Such oscillation is detrimental to crystal quality, since it introduces a region of high dislocation density. An average pull rate maximum of 2 cm/h has been found to allow for a smooth growth of 200 mm diameter crystals. The origin of the pull rate perturbation is discussed in terms of an instantaneous change in the equilibrium shape of the meniscus.

  18. Thermal effect mechanism of magnetoresistance in p-type diamond films

    Institute of Scientific and Technical Information of China (English)

    Qin Guo-Ping; Kong Chun-Yang; Ruan Hai-Bo; Huang Gui-Juan; Cui Yu-Ting; Fang Liang

    2010-01-01

    Based on the analysis and the discussion of the influence of thermal ionization energy and various scatterings on magnetoresistance(MR) of p-type diamond films, a revised model of valence band split-off over temperature is put forward, and a corresponding calculation formula is given for the MR of p-type diamond films (Corbino discs). It is shown that the theoretical calculation that the MR of diamond films changes with temperature is consistent with the experiment. The influence of Fermi energy level on MR of diamond films is discussed. Additionally, the thermal effect mechanism of MR in p-type diamond films is also explored.

  19. Characterization of plasma etching damage on p -type GaN using Schottky diodes

    OpenAIRE

    2008-01-01

    The plasma etching damage in p-type GaN has been characterized. From current-voltage and capacitance-voltage characteristics of Schottky diodes, it was revealed that inductively coupled plasma (ICP) etching causes an increase in series resistance of the Schottky diodes and compensation of acceptors in p-type GaN. We investigated deep levels near the valence band of p-type GaN using current deep level transient spectroscopy (DLTS), and no deep level originating from the ICP etching damage was ...

  20. Quantum conductance in silicon quantum wires

    CERN Document Server

    Bagraev, N T; Klyachkin, L E; Malyarenko, A M; Gehlhoff, W; Ivanov, V K; Shelykh, I A

    2002-01-01

    The results of investigations of electron and hole quantum conductance staircase in silicon quantum wires are presented. The characteristics of self-ordering quantum wells of n- and p-types, which from on the silicon (100) surface in the nonequilibrium boron diffusion process, are analyzed. The results of investigations of the quantum conductance as the function of temperature, carrier concentration and modulation degree of silicon quantum wires are given. It is found out, that the quantum conductance of the one-dimensional channels is observed, for the first time, at an elevated temperature (T >= 77 K)

  1. Origin of Photovoltage Enhancement via Interfacial Modification with Silver Nanoparticles Embedded in an a-SiC:H p-Type Layer in a-Si:H Solar Cells.

    Science.gov (United States)

    Li, Tiantian; Zhang, Qixing; Ni, Jian; Huang, Qian; Zhang, Dekun; Li, Baozhang; Wei, Changchun; Yan, Baojie; Zhao, Ying; Zhang, Xiaodan

    2017-03-17

    We used silver nanoparticles (Ag-NPs) embedded in the p-type semiconductor layer of hydrogenated amorphous silicon (a-Si:H) solar cells in the Schottky barrier contact design to modify the interface between aluminum-doped ZnO (ZnO:Al, AZO) and p-type hydrogenated amorphous silicon carbide (p-a-SiC:H) without plasmonic absorption. The high work function of the Ag-NPs provided a good channel for the transport of photogenerated holes. A p-type nanocrystalline SiC:H layer was used to compensate for the real surface defects and voids on the surface of Ag-NPs to reduce recombination at the AZO/p-type layer interface, which then enhanced the photovoltage of single-junction a-Si:H solar cells to values as high as 1.01 V. The Ag-NPs were around 10 nm in diameter and thermally stable in the p-type a-SiC:H film at the solar-cell process temperature. We will also show that a wide range of photovoltages between 1.01 and 2.89 V could be obtained with single-, double-, and triple-junction solar cells based on the single-junction a-Si:H solar cells with tunable high photovoltage. These solar cells are suitable photocathodes for solar water-splitting applications.

  2. Origin of the p-type character of AuCl3 functionalized carbon nanotubes

    KAUST Repository

    Murat, Altynbek

    2014-02-13

    The microscopic origin of the p-type character of AuCl3 functionalized carbon nanotubes (CNTs) is investigated using first-principles self-interaction corrected density functional theory (DFT). Recent DFT calculations suggest that the p-type character of AuCl3 functionalized CNTs is due to the Cl atoms adsorbed on the CNTs. We test this hypothesis and show that adsorbed Cl atoms only lead to a p-type character for very specific concentrations and arrangements of the Cl atoms, which furthermore are not the lowest energy configurations. We therefore investigate alternative mechanisms and conclude that the p-type character is due to the adsorption of AuCl4 molecules. The unraveling of the exact nature of the p-doping adsorbates is a key step for further development of AuCl3 functionalized CNTs in water sensor applications. © 2014 American Chemical Society.

  3. Theoretical prediction of p-type transparent conductivity in Zn-doped TiO2.

    Science.gov (United States)

    Han, Xiaoping; Shao, Guosheng

    2013-06-28

    It is very difficult and yet extremely important to fill the wide technological gap in developing transparent conducting oxides (TCOs) that exhibit excellent p-type conducting characteristics. Here, on the basis of extensive first-principles calculations, we discover for the first time potentially promising p-type transparent conductivity in Zn-doped TiO2 under oxygen rich conditions. Efforts have been made to elaborate the effects of possible defects and their interaction with Zn doping on the p-type transparent conductivity. This work offers a fundamental road map for cost-effective development of p-type TCOs based on TiO2, which is a cheap and stable material system of large natural resources.

  4. Formation and annealing of metastable (interstitial oxygen)-(interstitial carbon) complexes in n- and p-type silicon

    CERN Document Server

    Makarenko, L F; Lastovskii, S B; Murin, L I; Moll, M; Pintilie, I

    2014-01-01

    It is shown experimentally that, in contrast to the stable configuration of (interstitial carbon)-(interstitial oxygen) complexes (CiOi), the corresponding metastable configuration (CiOi{*}) cannot be found in n-Si based structures by the method of capacitance spectroscopy. The rates of transformation CiOi{*} -> CiOi are practically the same for both n- and p-Si with a concentration of charge carriers of no higher than 10(13) cm(-3). It is established that the probabilities of the simultaneous formation of stable and metastable configurations of the complex under study in the case of the addition of an atom of interstitial carbon to an atom of interstitial oxygen is close to 50\\%. This is caused by the orientation dependence of the interaction potential of an atom of interstitial oxygen with an interstitial carbon atom, which diffuses to this oxygen atom.

  5. Improved quality control of silicon wafers using novel off-line air pocket image analysis

    Science.gov (United States)

    Valley, John F.; Sanna, M. Cristina

    2014-08-01

    Air pockets (APK) occur randomly in Czochralski (Cz) grown silicon (Si) crystals and may become included in wafers after slicing and polishing. Previously the only APK of interest were those that intersected the front surface of the wafer and therefore directly impacted device yield. However mobile and other electronics have placed new demands on wafers to be internally APK-free for reasons of thermal management and packaging yield. We present a novel, recently patented, APK image processing technique and demonstrate the use of that technique, off-line, to improve quality control during wafer manufacturing.

  6. Comparison of measurements and simulation results in 300 mm CZ silicon crystal growth

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    A special thermal modeling tool, CrysVUn, which was developed by Crystal Growth Laboratory (CGL) of Fraunhofer Institute of Integrated Systems and Devices Technology in Erlangen of Germany, was used for numerical analysis of growth Interface situation. The heat transportation, argon flow and melt convection have been considered. Cauchy's first and second laws of motion have been the governing partial equations for stress calculation. The measurement results and simulation results were compared and the interface shape and thermal stress distribution during 300 mm Czochralski (CZ) silicon crystal growth with different growth rates were predicted.

  7. G-centers in irradiated silicon revisited: A screened hybrid density functional theory approach

    KAUST Repository

    Wang, H.

    2014-05-13

    Electronic structure calculations employing screened hybrid density functional theory are used to gain fundamental insight into the interaction of carbon interstitial (Ci) and substitutional (Cs) atoms forming the CiCs defect known as G-center in silicon (Si). The G-center is one of the most important radiation related defects in Czochralski grown Si. We systematically investigate the density of states and formation energy for different types of CiCs defects with respect to the Fermi energy for all possible charge states. Prevalence of the neutral state for the C-type defect is established.

  8. Effect of internal stresses on the mechanical parameters of silicon wafers

    Energy Technology Data Exchange (ETDEWEB)

    Oksanich, A.P.; Cherner, V.M.; Tuzovskii, K.A.

    1988-12-01

    The authors examined how the mechanical parameters of silicon wafers vary with the stress area. The polished (100) wafers were cut from a billet grown by Czochralski's method. The internal stresses were produced by moving the wafers in and out of an oven having a working zone at 1420 K. Then the oxide film was removed. The area of the stressed parts was determined by photoelasticity. The mechanical parameters were measured with contactless pneumatic loading and continuous central deflection measurement. The internal stresses affect the properties; at a given load the central deflection in an unstressed wafer is larger than in a stressed one.

  9. VV and VO2 defects in silicon studied with hybrid density functional theory

    KAUST Repository

    Christopoulos, Stavros Richard G

    2014-12-07

    The formation of VO (A-center), VV and VO2 defects in irradiated Czochralski-grown silicon (Si) is of technological importance. Recent theoretical studies have examined the formation and charge states of the A-center in detail. Here we use density functional theory employing hybrid functionals to analyze the formation of VV and VO2 defects. The formation energy as a function of the Fermi energy is calculated for all possible charge states. For the VV and VO2 defects double negatively charged and neutral states dominate, respectively.

  10. Origin and evolution of metal P-type ATPases in Plantae (Archaeplastida)

    OpenAIRE

    2014-01-01

    Metal ATPases are a subfamily of P-type ATPases involved in the transport of metal cations across biological membranes. They all share an architecture featuring eight transmembrane domains in pairs of two and are found in prokaryotes as well as in a variety of Eukaryotes. In Arabidopsis thaliana, eight metal P-type ATPases have been described, four being specific to copper transport and four displaying a broader metal specificity, including zinc, cadmium and possibly copper and calcium. So fa...

  11. Synthesis, crystal growth and mechanical properties of Bismuth Silicon Oxide (BSO) single crystal

    Energy Technology Data Exchange (ETDEWEB)

    Riscob, B. [CSIR – National Physical Laboratory, Crystal Growth and X-ray Analysis, New Delhi 110 012 (India); Institute for Plasma Research, Bhat, Gandhinagar 382428, Gujarat (India); Shkir, Mohd. [CSIR – National Physical Laboratory, Crystal Growth and X-ray Analysis, New Delhi 110 012 (India); Ganesh, V. [Department of Physics, Kakatiya University, Warangal 506 009 (India); Vijayan, N.; Maurya, K.K. [CSIR – National Physical Laboratory, Crystal Growth and X-ray Analysis, New Delhi 110 012 (India); Kishan Rao, K. [Department of Physics, Kakatiya University, Warangal 506 009 (India); Bhagavannarayana, G., E-mail: bhagavan@mail.nplindia.ernet.in [CSIR – National Physical Laboratory, Crystal Growth and X-ray Analysis, New Delhi 110 012 (India)

    2014-03-05

    Highlights: • Synthesis of Bismuth Silicon Oxide (BSO). • Single crystal growth of BSO by Czochralski (Cz) method. • Complete mechanical analysis by device fabrication point of view. • Theoretical and experimental calculations of mechanical properties. -- Abstract: Bismuth Silicon Oxide (BSO) is an efficient material for piezo-electric and electro-optic applications. In this article, growth of BSO single crystal by high temperature Czochralski melt growth technique and its detailed mechanical characterization by Vickers microhardness, fracture toughness, crack propagation, brittleness index and yield strength have been reported. The raw material was synthesized by solid state reaction using the stoichiometric ratio of high purity bismuth tri-oxide and silicon di-oxide. The synthesized material was charged in the platinum crucible and then melted. The required rotation and pulling rate was optimized for BSO single crystal growth and good quality single crystal has been harvested after a time span of 5 days. Powder X-ray diffraction analysis confirms the parent crystallization phase of BSO. The experimentally studied mechanical behavior of the crystal is explained using various theoretical models. The anisotropic nature of the crystals is studied using Knoop indentation technique.

  12. Convergence of valence bands for high thermoelectric performance for p-type InN

    Science.gov (United States)

    Li, Hai-Zhu; Li, Ruo-Ping; Liu, Jun-Hui; Huang, Ming-Ju

    2015-12-01

    Band engineering to converge the bands to achieve high valley degeneracy is one of effective approaches for designing ideal thermoelectric materials. Convergence of many valleys in the valence band may lead to a high Seebeck coefficient, and induce promising thermoelectric performance of p-type InN. In the current work, we have systematically investigated the electronic structure and thermoelectric performance of wurtzite InN by using the density functional theory combined with semiclassical Boltzmann transport theory. Form the results, it can be found that intrinsic InN has a large Seebeck coefficient (254 μV/K) and the largest value of ZeT is 0.77. The transport properties of p-type InN are better than that of n-type one at the optimum carrier concentration, which mainly due to the large Seebeck coefficient for p-type InN, although the electrical conductivity of n-type InN is larger than that of p-type one. We found that the larger Seebeck coefficient for p-type InN may originate from the large valley degeneracy in the valence band. Moreover, the low minimum lattice thermal conductivity for InN is one key factor to become a good thermoelectric material. Therefore, p-type InN could be a potential material for further applications in the thermoelectric area.

  13. Radiation damage in silicon. Defect analysis and detector properties

    Energy Technology Data Exchange (ETDEWEB)

    Hoenniger, F.

    2008-01-15

    Silicon microstrip and pixel detectors are vital sensor-components as particle tracking detectors for present as well as future high-energy physics (HEP) experiments. All experiments at the large Hadron Collider (LHC) are equipped with such detectors. Also for experiments after the upgrade of the LHC (the so-called Super-LHC), with its ten times higher luminosity, or the planned International Linear Collider (ILC) silicon tracking detectors are forseen. Close to the interaction region these detectors have to face harsh radiation fields with intensities above the presently tolerable level. defect engineering of the used material, e. g. oxygen enrichment of high resistivity float zone silicon and growing of thin low resistivityepitaxial layers on Czochralski silicon substrates has been established to improve the radiation hardness of silicon sensors. This thesis focuses mainly on the investigation of radiation induced defects and their differences observed in various kinds of epitaxial silicon material. Comparisons with other materials like float zone or Czochralski silicon are added. Deep Level Transient Spectroscopy (DLTS) and Thermally Stimulated Current (TSC) measurements have been performed after {gamma}-, electron-, proton- and neutron-irradiation. The differenced in the formation of vacancy and interstitial related defects as well as so-called clustered regions were investigated for various types of irradiation. In addition to the well known defects VO{sub i}, C{sub i}O{sub i}, C{sub i}C{sub s}, VP or V{sub 2} several other defect complexes have been found and investigated. Also the material dependence of the defect introduction rates and the defect annealing behavior has been studied by isothermal and isochronal annealing experiments. Especially the IO{sub 2} defect which is an indicator for the oxygen-dimer content of the material has been investigated in detail. On the basis of radiation induced defects like the bistable donor (BD) defect and a deep

  14. Europium and potassium co-doped strontium metaborate single crystals grown by the Czochralski method

    Science.gov (United States)

    Głowacki, Michał; Solarz, Piotr; Ryba-Romanowski, Witold; Martín, Inocencio R.; Diduszko, Ryszard; Berkowski, Marek

    2017-01-01

    Strontium metaborate (SrB2O4) is a suitable material for use as a matrix for luminescent dopant ions. Similarity of ionic radii of strontium and divalent europium makes it an excellent host for Eu dopant. This paper reports on the Czochralski growth and spectroscopic study of SrB2O4 single crystals doped with europium and co-doped with europium and potassium. Based on recorded luminescence spectra it was found that both Eu3+ and Eu2+ ions occur in this host. Trivalent europium ions give rise to a narrow-band long-lived red luminescence that is not affected by incorporation of potassium ions. Divalent europium ions emit a UV-blue luminescence, consisting of a large spectral band centered at ca 430 nm. In the absence of potassium ions the decay of this luminescence deviates slightly from a single exponential time dependence with a mean lifetime value of 2.0 ns. In potassium-co-doped sample a strong deviation from a single exponential decay was observed for longer stages of decay, beginning at ca 2.5 ns. This phenomenon was attributed to dissimilarity of relaxation rates of a fraction of europium ions distributed in different lattice sites that are distorted by the presence of big potassium ions. By co-doping the host with alkali ions one can influence the oxidation state of europium ions thereby enhancing the emission of trivalent europium ions. It was concluded that the material under study is a promising phosphor for visible light emission applications.

  15. Specific features of the formation of dislocation structure in gallium arsenide single crystals obtained by the Czochralski method

    Science.gov (United States)

    Parfenteva, I. B.; Pugachev, B. V.; Pavlov, V. F.; Kozlova, Yu. P.; Knyazev, C. N.; Yugova, T. G.

    2017-03-01

    The influence of the deviation of seed orientation from the [100] direction on the formation of a dislocation structure of gallium arsenide single crystals grown by the Czochralski method has been revealed. The intensive multiplication of dislocations and formation of a block structure occur at deviation by an angle of more than 3° in the region that is radially shifted to one of crystal sides. The linear density of dislocations in the walls changes from 1 × 104 cm-1 in low-angle boundaries to 6 × 104 cm-1 in subboundaries.

  16. Characterization and laser performance of a new material: 2 at. % Nd:YAG grown by the Czochralski method.

    Science.gov (United States)

    L'huillier, Johannes A; Bitz, Gunter; Wesemann, Volker; von Loewis of Menar, Patric; Wallenstein, Richard; Borsutzky, Annette; Ackermann, Lothar; Dupré, Klaus; Rytz, Daniel; Vernay, Sophie

    2002-07-20

    We report on the optical quality and laser performance of Czochralski-grown 2-at. %-doped Nd:YAG. Using a diode pumped laser in an end pumped configuration, we compare the laser performance of this material with the performance of 1-at. %-doped Nd:YAG and 0.7-at. %-doped Nd:YVO4 crystals. Experimental results show the superior performance of 2-at. % Nd:YAG over Nd:YVO4. With a pump power of 25.7 W, a maximum output power of 12.3 W with a slope efficiency of 57% and an optical-to-optical efficiency of 48% were achieved.

  17. Silicon-Germanium Alloys for Infrared Detectors.

    Science.gov (United States)

    1980-04-01

    crystals, aiming at improved crystallinity and higher resistivity and to extend the Czochralski growth method to indium-doped Si-Ge alloys. Our intention...of the disappointingly high boron concentrations achieved in Czochralski growth, we decided to explore a crucible-free method for preparing Si-Ge...material was not high enough to allow an adequately long depletion region in a p-i-n detector. It does not appear that any Czochralski -type growth method

  18. Fabrication and electrical characterization of Al/DNA-CTMA/ p-type a-Si:H photodiode based on DNA-CTMA biomaterial

    Science.gov (United States)

    Siva Pratap Reddy, M.; Puneetha, Peddathimula; Lee, Young-Woong; Jeong, Seong-Hoon; Park, Chinho

    2017-01-01

    In this work, a deoxyribonucleic acid-cetyltrimethylammonium chloride (DNA-CTMA) biomaterial based p-type hydrogenated amorphous silicon ( a-Si:H) photodiode (PD) is fabricated and its electrical characteristics are investigated. The Al/DNA-CTMA/ p-type a-Si:H PD parameters are studied using current-voltage ( I-V), capacitancevoltage-frequency ( C-V-f) and conductance-voltage-frequency ( G/ω-V-f) measurements. The barrier height and the ideality factor of the diode are found to be 0.78 eV and 1.9, respectively. The electrical and photoconductivity properties of the diode are analyzed by using dark I-V and transient photocurrent techniques. The C-V-f and G/ω-V-f measurements indicate that the capacitance and conductance of the diode depend on the voltage and frequency, respectively. The experimental results reveal that the decreases in capacitance and the increases in conductance with an increase in frequency can be explained on the basis of interface states ( N SS ). Series resistance ( R S ) measurements are performed on the diode and discussed here. The obtained electrical parameters confirm that the Al/DNA-CTMA/ p-type a-Si:H PD can be used as an optical sensor for the development of commercial applications that are environmentally benign. [Figure not available: see fulltext.

  19. Improvement in thermoelectric power factor of mechanically alloyed p-type SiGe by incorporation of TiB2

    Science.gov (United States)

    Ahmad, Sajid; Dubey, K.; Bhattacharya, Shovit; Basu, Ranita; Bhatt, Ranu; Bohra, A. K.; Singh, Ajay; Aswal, D. K.; Gupta, S. K.

    2016-05-01

    Nearly 60% of the world's useful energy is wasted as heat and recovering a fraction of this waste heat by converting it as useful electrical power is an important area of research[1]. Thermoelectric power generators (TEG) are solid state devices which converts heat into electricity. TEG consists of n and p-type thermoelements connected electrically in series and thermally in parallel[2]. Silicon germanium (SiGe) alloy is one of the conventional high temperature thermoelectric materials and is being used in radio-isotopes based thermoelectric power generators for deep space exploration programs.Temperature (T) dependence of thermoelectric (TE) properties of p-type SiGe and p-type SiGe-x wt.%TiB2 (x=6,8,10%) nanocomposite materials has been studied with in the temperature range of 300 K to 1100 K. It is observed that there is an improvement in the power factor (α2/ρ) of SiGe alloy on addition of TiB2 upto 8 wt.% that is mainly due to increase in the Seebeck coefficient (α) and electrical conductivity (σ) of the alloy.

  20. Improvement in thermoelectric power factor of mechanically alloyed p-type SiGe by incorporation of TiB{sub 2}

    Energy Technology Data Exchange (ETDEWEB)

    Ahmad, Sajid, E-mail: sajidahmadiitkgp@gmail.com [Nuclear Research Laboratory, Astrophysical Sciences Division, B.A.R.C., Zakura, Srinagar, Kashmir-190024 (India); Dubey, K. [Barkatullah University, Bhopal–462026 (India); Bhattacharya, Shovit; Basu, Ranita; Bhatt, Ranu; Bohra, A. K.; Singh, Ajay; Aswal, D. K.; Gupta, S. K. [Technical Physics Division, B.A.R.C., Trombay, Mumbai – 400085 (India)

    2016-05-23

    Nearly 60% of the world’s useful energy is wasted as heat and recovering a fraction of this waste heat by converting it as useful electrical power is an important area of research{sup [1]}. Thermoelectric power generators (TEG) are solid state devices which converts heat into electricity. TEG consists of n and p-type thermoelements connected electrically in series and thermally in parallel{sup [2]}. Silicon germanium (SiGe) alloy is one of the conventional high temperature thermoelectric materials and is being used in radio-isotopes based thermoelectric power generators for deep space exploration programs.Temperature (T) dependence of thermoelectric (TE) properties of p-type SiGe and p-type SiGe-x wt.%TiB{sub 2} (x=6,8,10%) nanocomposite materials has been studied with in the temperature range of 300 K to 1100 K. It is observed that there is an improvement in the power factor (α{sup 2}/ρ) of SiGe alloy on addition of TiB{sub 2} upto 8 wt.% that is mainly due to increase in the Seebeck coefficient (α) and electrical conductivity (σ) of the alloy.

  1. Formation of p-type ZnO thin film through co-implantation

    Science.gov (United States)

    Chuang, Yao-Teng; Liou, Jhe-Wei; Woon, Wei-Yen

    2017-01-01

    We present a study on the formation of p-type ZnO thin film through ion implantation. Group V dopants (N, P) with different ionic radii are implanted into chemical vapor deposition grown ZnO thin film on GaN/sapphire substrates prior to thermal activation. It is found that mono-doped ZnO by N+ implantation results in n-type conductivity under thermal activation. Dual-doped ZnO film with a N:P ion implantation dose ratio of 4:1 is found to be p-type under certain thermal activation conditions. Higher p-type activation levels (1019 cm-3) under a wider thermal activation range are found for the N/P dual-doped ZnO film co-implanted by additional oxygen ions. From high resolution x-ray diffraction and x-ray photoelectron spectroscopy it is concluded that the observed p-type conductivities are a result of the promoted formation of PZn-4NO complex defects via the concurrent substitution of nitrogen at oxygen sites and phosphorus at zinc sites. The enhanced solubility and stability of acceptor defects in oxygen co-implanted dual-doped ZnO film are related to the reduction of oxygen vacancy defects at the surface. Our study demonstrates the prospect of the formation of stable p-type ZnO film through co-implantation.

  2. Nanostructured p-Type Semiconductor Electrodes and Photoelectrochemistry of Their Reduction Processes

    Directory of Open Access Journals (Sweden)

    Matteo Bonomo

    2016-05-01

    Full Text Available This review reports the properties of p-type semiconductors with nanostructured features employed as photocathodes in photoelectrochemical cells (PECs. Light absorption is crucial for the activation of the reduction processes occurring at the p-type electrode either in the pristine or in a modified/sensitized state. Beside thermodynamics, the kinetics of the electron transfer (ET process from photocathode to a redox shuttle in the oxidized form are also crucial since the flow of electrons will take place correctly if the ET rate will overcome that one of recombination and trapping events which impede the charge separation produced by the absorption of light. Depending on the nature of the chromophore, i.e., if the semiconductor itself or the chemisorbed dye-sensitizer, different energy levels will be involved in the cathodic ET process. An analysis of the general properties and requirements of electrodic materials of p-type for being efficient photoelectrocatalysts of reduction processes in dye-sensitized solar cells (DSC will be given. The working principle of p-type DSCs will be described and extended to other p-type PECs conceived and developed for the conversion of the solar radiation into chemical products of energetic/chemical interest like non fossil fuels or derivatives of carbon dioxide.

  3. Recent Developments in p-Type Oxide Semiconductor Materials and Devices

    KAUST Repository

    Wang, Zhenwei

    2016-02-16

    The development of transparent p-type oxide semiconductors with good performance may be a true enabler for a variety of applications where transparency, power efficiency, and greater circuit complexity are needed. Such applications include transparent electronics, displays, sensors, photovoltaics, memristors, and electrochromics. Hence, here, recent developments in materials and devices based on p-type oxide semiconductors are reviewed, including ternary Cu-bearing oxides, binary copper oxides, tin monoxide, spinel oxides, and nickel oxides. The crystal and electronic structures of these materials are discussed, along with approaches to enhance valence-band dispersion to reduce effective mass and increase mobility. Strategies to reduce interfacial defects, off-state current, and material instability are suggested. Furthermore, it is shown that promising progress has been made in the performance of various types of devices based on p-type oxides. Several innovative approaches exist to fabricate transparent complementary metal oxide semiconductor (CMOS) devices, including novel device fabrication schemes and utilization of surface chemistry effects, resulting in good inverter gains. However, despite recent developments, p-type oxides still lag in performance behind their n-type counterparts, which have entered volume production in the display market. Recent successes along with the hurdles that stand in the way of commercial success of p-type oxide semiconductors are presented.

  4. CuNb3O8: A p-Type Semiconducting Metal Oxide Photoelectrode.

    Science.gov (United States)

    Joshi, Upendra A; Maggard, Paul A

    2012-06-07

    A new p-type CuNb3O8 polycrystalline photoelectrode was investigated and was determined to have indirect and direct bandgap sizes of 1.26 and 1.47 eV, respectively. The p-type polycrystalline film could be prepared on fluorine-doped tin oxide glass and yielded a cathodic photocurrent under visible-light irradiation (λ > 420 nm) with incident photon-to-current efficiencies of up to ∼6-7% and concomitant hydrogen evolution. A Mott-Schottky analysis yielded a flat band potential of +0.35 V versus RHE (pH = 6.3) and a calculated p-type dopant concentration of ∼7.2 × 10(15) cm(-3). The conduction band energies are found to be negative enough for the reduction of water under visible light irradiation. A hole mobility of ∼145 cm(2)/V·s was obtained from J(I)-V(2) measurements using the Mott-Gurney relation, which is ∼50% higher than that typically found for p-type Cu2O. DFT-based electronic structure calculations were used to probe the atomic and structural origins of the band gap transitions and carrier mobility. Thus, a new p-type semiconductor is discovered for potential applications in solar energy conversion.

  5. Chemical-free n-type and p-type multilayer-graphene transistors

    Energy Technology Data Exchange (ETDEWEB)

    Dissanayake, D. M. N. M., E-mail: nandithad@voxtel-inc.com [Voxtel Inc, Lockey Laboratories, University of Oregon, Eugene Oregon 97402 (United States); Eisaman, M. D. [Sustainable Energy Technologies Department, Brookhaven National Laboratory, Upton, New York 11973 (United States); Department of Electrical and Computer Engineering, Stony Brook University, Stony Brook, New York 11794 (United States); Department of Physics and Astronomy, Stony Brook University, Stony Brook, New York 11794 (United States)

    2016-08-01

    A single-step doping method to fabricate n- and p-type multilayer graphene (MG) top-gate field effect transistors (GFETs) is demonstrated. The transistors are fabricated on soda-lime glass substrates, with the n-type doping of MG caused by the sodium in the substrate without the addition of external chemicals. Placing a hydrogen silsesquioxane (HSQ) barrier layer between the MG and the substrate blocks the n-doping, resulting in p-type doping of the MG above regions patterned with HSQ. The HSQ is deposited in a single fabrication step using electron beam lithography, allowing the patterning of arbitrary sub-micron spatial patterns of n- and p-type doping. When a MG channel is deposited partially on the barrier and partially on the glass substrate, a p-type and n-type doping profile is created, which is used for fabricating complementary transistors pairs. Unlike chemically doped GFETs in which the external dopants are typically introduced from the top, these substrate doped GFETs allow for a top gate which gives a stronger electrostatic coupling to the channel, reducing the operating gate bias. Overall, this method enables scalable fabrication of n- and p-type complementary top-gated GFETs with high spatial resolution for graphene microelectronic applications.

  6. Recent Developments in p-Type Oxide Semiconductor Materials and Devices.

    Science.gov (United States)

    Wang, Zhenwei; Nayak, Pradipta K; Caraveo-Frescas, Jesus A; Alshareef, Husam N

    2016-05-01

    The development of transparent p-type oxide semiconductors with good performance may be a true enabler for a variety of applications where transparency, power efficiency, and greater circuit complexity are needed. Such applications include transparent electronics, displays, sensors, photovoltaics, memristors, and electrochromics. Hence, here, recent developments in materials and devices based on p-type oxide semiconductors are reviewed, including ternary Cu-bearing oxides, binary copper oxides, tin monoxide, spinel oxides, and nickel oxides. The crystal and electronic structures of these materials are discussed, along with approaches to enhance valence-band dispersion to reduce effective mass and increase mobility. Strategies to reduce interfacial defects, off-state current, and material instability are suggested. Furthermore, it is shown that promising progress has been made in the performance of various types of devices based on p-type oxides. Several innovative approaches exist to fabricate transparent complementary metal oxide semiconductor (CMOS) devices, including novel device fabrication schemes and utilization of surface chemistry effects, resulting in good inverter gains. However, despite recent developments, p-type oxides still lag in performance behind their n-type counterparts, which have entered volume production in the display market. Recent successes along with the hurdles that stand in the way of commercial success of p-type oxide semiconductors are presented.

  7. Silicon-Rich Silicon Carbide Hole-Selective Rear Contacts for Crystalline-Silicon-Based Solar Cells.

    Science.gov (United States)

    Nogay, Gizem; Stuckelberger, Josua; Wyss, Philippe; Jeangros, Quentin; Allebé, Christophe; Niquille, Xavier; Debrot, Fabien; Despeisse, Matthieu; Haug, Franz-Josef; Löper, Philipp; Ballif, Christophe

    2016-12-28

    The use of passivating contacts compatible with typical homojunction thermal processes is one of the most promising approaches to realizing high-efficiency silicon solar cells. In this work, we investigate an alternative rear-passivating contact targeting facile implementation to industrial p-type solar cells. The contact structure consists of a chemically grown thin silicon oxide layer, which is capped with a boron-doped silicon-rich silicon carbide [SiCx(p)] layer and then annealed at 800-900 °C. Transmission electron microscopy reveals that the thin chemical oxide layer disappears upon thermal annealing up to 900 °C, leading to degraded surface passivation. We interpret this in terms of a chemical reaction between carbon atoms in the SiCx(p) layer and the adjacent chemical oxide layer. To prevent this reaction, an intrinsic silicon interlayer was introduced between the chemical oxide and the SiCx(p) layer. We show that this intrinsic silicon interlayer is beneficial for surface passivation. Optimized passivation is obtained with a 10-nm-thick intrinsic silicon interlayer, yielding an emitter saturation current density of 17 fA cm(-2) on p-type wafers, which translates into an implied open-circuit voltage of 708 mV. The potential of the developed contact at the rear side is further investigated by realizing a proof-of-concept hybrid solar cell, featuring a heterojunction front-side contact made of intrinsic amorphous silicon and phosphorus-doped amorphous silicon. Even though the presented cells are limited by front-side reflection and front-side parasitic absorption, the obtained cell with a Voc of 694.7 mV, a FF of 79.1%, and an efficiency of 20.44% demonstrates the potential of the p(+)/p-wafer full-side-passivated rear-side scheme shown here.

  8. Transparent p-type SnO nanowires with unprecedented hole mobility among oxide semiconductors

    KAUST Repository

    Caraveo-Frescas, J. A.

    2013-11-25

    p-type tin monoxide (SnO) nanowire field-effect transistors with stable enhancement mode behavior and record performance are demonstrated at 160 °C. The nanowire transistors exhibit the highest field-effect hole mobility (10.83 cm2 V−1 s−1) of any p-type oxide semiconductor processed at similar temperature. Compared to thin film transistors, the SnO nanowire transistors exhibit five times higher mobility and one order of magnitude lower subthreshold swing. The SnO nanowire transistors show three times lower threshold voltages (−1 V) than the best reported SnO thin film transistors and fifteen times smaller than p-type Cu 2O nanowire transistors. Gate dielectric and process temperature are critical to achieving such performance.

  9. DyP-type peroxidases comprise a novel heme peroxidase family.

    Science.gov (United States)

    Sugano, Y

    2009-04-01

    Dye-decolorizing peroxidase (DyP) is produced by a basidiomycete (Thanatephorus cucumeris Dec 1) and is a member of a novel heme peroxidase family (DyP-type peroxidase family) that appears to be distinct from general peroxidases. Thus far, 80 putative members of this family have been registered in the PeroxiBase database (http://peroxibase.isbsib.ch/) and more than 400 homologous proteins have been detected via PSI-BLAST search. Although few studies have characterized the function and structure of these proteins, they appear to be bifunctional enzymes with hydrolase or oxygenase, as well as typical peroxidase activities. DyP-type peroxidase family suggests an ancient root compared with other general peroxidases because of their widespread distribution in the living world. In this review, firstly, an outline of the characteristics of DyP from T. cucumeris is presented and then interesting characteristics of the DyP-type peroxidase family are discussed.

  10. Demethoxycurcumin is a potent inhibitor of P-type ATPases from diverse kingdoms of life

    DEFF Research Database (Denmark)

    Dao, Trong Tuan; Sehgal, Pankaj; Thanh Tung, Truong;

    2016-01-01

    the curcuminoids, demethoxycurcumin was the most potent inhibitor of all tested P-type ATPases from fungal (Pma1p; H+-ATPase), plant (AHA2; H+-ATPase) and animal (SERCA; Ca2+-ATPase) cells. All three curcuminoids acted as non-competitive antagonist to ATP and hence may bind to a highly conserved allosteric site......P-type ATPases catalyze the active transport of cations and phospholipids across biological membranes. Members of this large family are involved in a range of fundamental cellular processes. To date, a substantial number of P-type ATPase inhibitors have been characterized, some of which are used...... as drugs. In this work a library of natural compounds was screened and we first identified curcuminoids as plasma membrane H+-ATPases inhibitors in plant and fungal cells. We also found that some of the commercial curcumins contain several curcuminoids. Three of these were purified and, among...

  11. A simple model to estimate the optimal doping of p - Type oxide superconductors

    Directory of Open Access Journals (Sweden)

    Adir Moysés Luiz

    2008-12-01

    Full Text Available Oxygen doping of superconductors is discussed. Doping high-Tc superconductors with oxygen seems to be more efficient than other doping procedures. Using the assumption of double valence fluctuations, we present a simple model to estimate the optimal doping of p-type oxide superconductors. The experimental values of oxygen content for optimal doping of the most important p-type oxide superconductors can be accounted for adequately using this simple model. We expect that our simple model will encourage further experimental and theoretical researches in superconducting materials.

  12. High surface hole concentration p-type GaN using Mg implantation

    CERN Document Server

    Long Tao; Zhang Guo Yi

    2001-01-01

    Mg ions were implanted on Mg-doped GaN grown by metalorganic chemical vapor deposition (MOCVD). The p-type GaN was achieved with high hole concentration (8.28 x 10 sup 1 sup 7 cm sup - sup 3) conformed by Van derpauw Hall measurement after annealing at 800 degree C for 1 h. this is the first experimental report of Mg implantation on Mg-doped GaN and achieving p-type GaN with high surface hole concentration

  13. Hall and thermoelectric evaluation of p-type InAs

    Energy Technology Data Exchange (ETDEWEB)

    Wagener, M.C., E-mail: magnus.wagener@nmmu.ac.z [Department of Physics, Nelson Mandela Metropolitan University, Port Elizabeth (South Africa); Wagener, V.; Botha, J.R. [Department of Physics, Nelson Mandela Metropolitan University, Port Elizabeth (South Africa)

    2009-12-15

    This paper compares the galvanometric and thermoelectric evaluation of the electrical characteristics of narrow gap semiconductors. In particular, the influence of a surface inversion layer is incorporated into the analysis of the temperature-dependent Hall and thermoelectric measurements of p-type InAs. The temperature at which the Seebeck coefficient of p-type material changes sign is shown to be unaffected by the presence of degenerate conduction paths. This finding consequently facilitated the direct determination of the acceptor density of lightly doped thin film InAs.

  14. Capillary stability of vapor-liquid-solid crystallization processes and their comparison to Czochralski and Stepanov growth methods

    Science.gov (United States)

    Nebol'sin, Valery A.; Suyatin, Dmitry B.; Dunaev, Alexander I.; Tatarenkov, Alexander F.

    2017-04-01

    Epitaxial semiconductor nanowires grown with vapor-liquid-solid crystallization processes are very attractive nanoscale objects for many different applications. Despite extensive studies of the growth mechanism, there is still a lack of understanding of the growth process; in particular, the stability of the vapor-liquid-solid crystallization process has not previously been studied. Here we examine the capillary stability of the vapor-liquid-solid growth of nanowires and filamentary crystals with different diameters and demonstrate that the growth is stable for small Bond numbers when the meniscus height is linearly dependent on catalyst diameter. The capillary stability of vapor-liquid-solid growth is also compared with capillary stability in the Stepanov and Czochralski crystal growth methods; it is shown that capillary stability is not possible in the Czochralski method, although it is possible in the Stepanov growth method when the ratio of crystal diameter to shaper diameter is >1/2. These findings are important for better understanding and improved control of the growth of nanowires and filamentary crystals and indicate, for example, that large diameter filamentary crystals can be grown via a vapor-liquid-solid mechanism if the influence of gravity forces on the liquid catalytic particle shape can be reduced.

  15. Nonlinear model-based control of the Czochralski process III: Proper choice of manipulated variables and controller parameter scheduling

    Science.gov (United States)

    Neubert, M.; Winkler, J.

    2012-12-01

    This contribution continues an article series [1,2] about the nonlinear model-based control of the Czochralski crystal growth process. The key idea of the presented approach is to use a sophisticated combination of nonlinear model-based and conventional (linear) PI controllers for tracking of both, crystal radius and growth rate. Using heater power and pulling speed as manipulated variables several controller structures are possible. The present part tries to systematize the properties of the materials to be grown in order to get unambiguous decision criteria for a most profitable choice of the controller structure. For this purpose a material specific constant M called interface mobility and a more process specific constant S called system response number are introduced. While the first one summarizes important material properties like thermal conductivity and latent heat the latter one characterizes the process by evaluating the average axial thermal gradients at the phase boundary and the actual growth rate at which the crystal is grown. Furthermore these characteristic numbers are useful for establishing a scheduling strategy for the PI controller parameters in order to improve the controller performance. Finally, both numbers give a better understanding of the general thermal system dynamics of the Czochralski technique.

  16. Determination of Shear Deformation Potentials from the Free-Carrier Piezobirefringence in Germanium and Silicon

    DEFF Research Database (Denmark)

    Riskaer, Sven

    1966-01-01

    The present investigations of the free-carrier piezobirefringence phenomenon verify that in n-type germanium and silicon as well as in p-type silicon this effect can be ascribed to intraband transitions of the carriers. It is demonstrated how a combined investigation of the low-stress and high-st......, experimental evidence is given to support the assumption, that in p-type germanium intraband transitions alone cannot account for the free-carrier piezobirefringence....

  17. Polycrystalline Silicon Sheets for Solar Cells by the Improved Spinning Method

    Science.gov (United States)

    Maeda, Y.; Yokoyama, T.; Hide, I.

    1984-01-01

    Cost reduction of silicon materials in the photovoltaic program of materials was examined. The current process of producing silicon sheets is based entirely on the conventional Czochralski ingot growth and wafering used in the semiconductor industry. The current technology cannot meet the cost reduction demands for producing low cost silicon sheets. Alternative sheet production processes such as unconventional crystallization are needed. The production of polycrystalline silicon sheets by unconventional ingot technology is the casting technique. Though large grain sheets were obtained by this technique, silicon ribbon growth overcomes deficiencies of the casting process by obtaining the sheet directly from the melt. The need to solve difficulties of growth stability and impurity effects are examined. The direct formation process of polycrystalline silicon sheets with large grain size, smooth surface, and sharp edges from the melt with a high growth rate which will yield low cost silicon sheets for solar cells and the photovoltaic characteristics associated with this type of sheet to include an EBIC study of the grain boundaries are described.

  18. Efficiency Improvement of HIT Solar Cells on p-Type Si Wafers

    OpenAIRE

    Chun-You Wei; Chu-Hsuan Lin; Hao-Tse Hsiao; Po-Chuan Yang; Chih-Ming Wang; Yen-Chih Pan

    2013-01-01

    Single crystal silicon solar cells are still predominant in the market due to the abundance of silicon on earth and their acceptable efficiency. Different solar-cell structures of single crystalline Si have been investigated to boost efficiency; the heterojunction with intrinsic thin layer (HIT) structure is currently the leading technology. The record efficiency values of state-of-the art HIT solar cells have always been based on n-type single-crystalline Si wafers. Improving the efficiency ...

  19. Silicon spintronics.

    Science.gov (United States)

    Jansen, Ron

    2012-04-23

    Worldwide efforts are underway to integrate semiconductors and magnetic materials, aiming to create a revolutionary and energy-efficient information technology in which digital data are encoded in the spin of electrons. Implementing spin functionality in silicon, the mainstream semiconductor, is vital to establish a spin-based electronics with potential to change information technology beyond imagination. Can silicon spintronics live up to the expectation? Remarkable advances in the creation and control of spin polarization in silicon suggest so. Here, I review the key developments and achievements, and describe the building blocks of silicon spintronics. Unexpected and puzzling results are discussed, and open issues and challenges identified. More surprises lie ahead as silicon spintronics comes of age.

  20. Platinum monolayer electrocatalyst on gold nanostructures on silicon for photoelectrochemical hydrogen evolution.

    Science.gov (United States)

    Kye, Joohong; Shin, Muncheol; Lim, Bora; Jang, Jae-Won; Oh, Ilwhan; Hwang, Seongpil

    2013-07-23

    Pt monolayer decorated gold nanostructured film on planar p-type silicon is utilized for photoelectrochemical H2 generation in this work. First, gold nanostructured film on silicon was spontaneously produced by galvanic displacement of the reduction of gold ion and the oxidation of silicon in the presence of fluoride anion. Second, underpotential deposition (UPD) of copper under illumination produced Cu monolayer on gold nanostructured film followed by galvanic exchange of less-noble Cu monolayer with more-noble PtCl6(2-). Pt(shell)/Au(core) on p-type silicon showed the similar activity with platinum nanoparticle on silicon for photoelectrochemical hydrogen evolution reaction in spite of low platinum loading. From Tafel analysis, Pt(shell)/Au(core) electrocatalyst shows the higher area-specific activity than platinum nanoparticle on silicon demonstrating the significant role of underlying gold for charge transfer reaction from silicon to H(+) through platinum catalyst.

  1. Dislocation-related luminescence in Er-implanted silicon

    Energy Technology Data Exchange (ETDEWEB)

    Sobolev, N.A.; Gusev, O.B.; Shek, E.I. [Ioffe Physicotechnical Institute, Polytechnicheskaya 26, St. Petersburg (Russian Federation); Vdovin, V.I.; Yugova, T.G. [Institute for Chemical Problems of Microelectronics, Moscow (Russian Federation); Emel' yanov, A.M. [St. Petersburg State Technical University, St. Petersburg (Russian Federation)

    1998-12-01

    The behavior of luminescence spectra and structural defects in single crystal Czochralski silicon after erbium implantation at 1-1.8 MeV energies and 1x10{sup 13} cm{sup -2} dose with subsequent annealing at 1000-1200C for 0.25-3 h in argon and a chlorine-containing ambience (CCA) was studied by photoluminescence (PL), transmission electron microscopy and chemical etching/Nomarski microscopy. We have found that annealing in CCA gives rise to dislocation loops and pure edge dislocations with dominant dislocation-related lines in the PL spectrum. Pure edge dislocations are responsible for the appearance of the lines. (Copyright (c) 1998 Elsevier Science B.V., Amsterdam. All rights reserved.)

  2. Realization of Ag-S codoped p-type ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Xu, Tian Ning, E-mail: xtn9886@zju.edu.cn [Department of Science, Zhijiang College of Zhejiang University of Technology, Hangzhou, Zhejiang 310024 (China); Department of Physics, State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou, Zhejiang 310027 (China); Li, Xiang; Lu, Zhong [Department of Science, Zhijiang College of Zhejiang University of Technology, Hangzhou, Zhejiang 310024 (China); Chen, Yong Yue [Department of Physics, State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou, Zhejiang 310027 (China); Sui, Cheng Hua [Department of Science, Zhijiang College of Zhejiang University of Technology, Hangzhou, Zhejiang 310024 (China); Wu, Hui Zhen [Department of Physics, State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou, Zhejiang 310027 (China)

    2014-10-15

    Highlights: • Ag-S codoped p-type ZnO thin films have been fabricated. • The films exhibit low resistivity and high Hall mobility and hole concentration. • A ZnO:(Ag, S)/i-ZnO/ZnO:Al homojunction has been fabricated and shows rectifying behaviors. - Abstract: Ag-S codoped ZnO films have been grown on quartz substrates by e-beam evaporation at low temperature (100 °C). The effects of Ag{sub 2}S content on the structural and electrical properties of the films were investigated. The results showed that 2 wt% Ag{sub 2}S doped films exhibited p-type conduction, with a resistivity of 0.0347 Ω cm, a Hall mobility of 9.53 cm{sup 2} V{sup −1} s{sup −1}, and a hole concentration of 1.89 × 10{sup 19} cm{sup −3} at room temperature. The X-ray photoelectron spectroscopy measurements showed that Ag and S have been incorporated into the films. To further confirm the p-type conduction of Ag-S codoped ZnO films, a ZnO:(Ag, S)/i-ZnO/ZnO:Al homojunction was fabricated and rectifying behaviors of which was measured. High electrical performance and low growth temperature indicate that Ag{sub 2}S is a promising dopant to fabricate p-type Ag-S codoped ZnO films.

  3. Relative Frequencies of G and P Types among Rotaviruses from Indian Diarrheic Cow and Buffalo Calves

    Science.gov (United States)

    Gulati, Baldev R.; Nakagomi, Osamu; Koshimura, Yumi; Nakagomi, Toyoko; Pandey, Ramayan

    1999-01-01

    While an increasing number of studies suggest that there is a high prevalence of rotaviruses with P8[11], a typical P type of bovine rotavirus (BRV), among human neonates or infants in India, no data are available on the distribution of G and P types of Indian BRVs. Thus, fecal specimens were collected from cow and buffalo calves under 1 month of age on organized dairy farms in India during the period between 1994 and 1997, and 36 rotavirus-positive specimens were used to determine the relative frequencies of the G and P types of Indian BRVs. As to the G type, G10 was predominant (83%), followed by G6 (6%). The majority (94%) of BRVs had P8[11], and only one isolate possessed P6[1]. The most common combination of G and P types was G10P8[11] (81%), followed by G6P6[1] (3%) and G6P8[11] (3%). The high prevalence of BRVs possessing P8[11] VP4s strongly supports the hypothesis that BRVs may cross the host species barrier and circulate among neonates in India. PMID:10325385

  4. Characterization of 3D-DDTC detectors on p-type substrates

    CERN Document Server

    Betta, G -F Dalla; Bosisio, Luciano; Darbo, Giovanni; Gabos, Paolo; Gemme, Claudia; Koehler, Michael; La Rosa, Alessandro; Parzefall, Ulrich; Pernegger, Heinz; Piemonte, Claudio; Povoli, Marco; Rachevskaia, Irina; Ronchin, Sabina; Wiik, Liv; Zoboli, Aanrea; Zorzi, Nicola

    2009-01-01

    We report on the electrical and functional characterization of 3D Double-side, Double-Type-Column (3D- DDTC) detectors fabricated on p-type substrates. Results relevant to detectors in the diode, strip and pixel configurations are presented, and demonstrate a clear improvement in the charge collection performance compared to the first prototypes of these detectors.

  5. Origin and evolution of metal p-Type ATPases in Plantae (Archaeplastida

    Directory of Open Access Journals (Sweden)

    Marc eHanikenne

    2014-01-01

    Full Text Available Metal ATPases are a subfamily of P-type ATPases involved in the transport of metal cations across biological membranes. They all share an architecture featuring eight transmembrane domains in pairs of two and are found in prokaryotes as well as in a variety of Eukaryotes. In Arabidopsis thaliana, eight metal P-type ATPases have been described, four being specific to copper transport and four displaying a broader metal specificity, including zinc, cadmium and possibly copper and calcium. So far, few efforts have been devoted to elucidating the origin and evolution of these proteins in Eukaryotes. In this work, we use large-scale phylogenetics to show that metal P-type ATPases form a homogenous group among P-type ATPases and that their specialisation into either monovalent (Cu or divalent (Zn, Cd… metal transport stems from a gene duplication that took place early in the evolution of Life. Then, we demonstrate that the four subgroups of plant metal ATPases all have a different evolutionary origin and a specific taxonomic distribution, only one tracing back to the cyanobacterial progenitor of the chloroplast. Finally, we examine the subsequent evolution of these proteins in green plants and conclude that the genes thoroughly characterised in model organisms are often the result of lineage-specific gene duplications, which calls for caution when attempting to infer function from sequence similarity alone in non-model organisms.

  6. Synthesis of p-type and n-type nickel ferrites and associated electrical properties

    Energy Technology Data Exchange (ETDEWEB)

    Šutka, Andris, E-mail: andris.sutka@rtu.lv [Faculty of Material Science and Applied Chemistry, Riga Technical University, Paula Valdena 3, Riga, LV-1048 (Latvia); Institute of Physics, University of Tartu, Ravila 14c, 50411, 51014 Tartu (Estonia); Pärna, Rainer [Institute of Physics, University of Tartu, Ravila 14c, 50411, 51014 Tartu (Estonia); Estonian Nanotechnology Competence Centre, Ravila 14c, 50411, 51014 Tartu (Estonia); Käämbre, Tanel [Institute of Physics, University of Tartu, Ravila 14c, 50411, 51014 Tartu (Estonia); Kisand, Vambola [Institute of Physics, University of Tartu, Ravila 14c, 50411, 51014 Tartu (Estonia); Estonian Nanotechnology Competence Centre, Ravila 14c, 50411, 51014 Tartu (Estonia)

    2015-01-01

    We used sol–gel auto combustion to synthesize nickel ferrites of p-type and n-type conductivity by controlling the relative amounts of nickel and iron during synthesis. The obtained samples have been characterized by XRD, FE-SEM, electrical measurements and XPS. We observe huge differences in the effect of grain size on the electrical resistivity between the p-type and the n-type material when the grain size increases from nano to micro scale during annealing at temperatures from 900 {sup o}C to 1300 {sup o}C. The observed resistivity decrease (due to grain size) is four orders of magnitude in the n-type nickel ferrite, whereas the p-type material remains virtually unaffected. We rationalize this drastic difference to stem from a reverse contrast of the surface (grain shell) versus bulk (grain core) conductivity between p- and n-type ferrite. With the grain shells in p-type the easier charge carrier path the effect of scatter at grain boundaries is accordingly diminished, whereas in the n-type charge transport properties are controlled by (the number of) grain boundaries in a conduction path.

  7. A structural and functional perspective of DyP-type peroxidase family.

    Science.gov (United States)

    Yoshida, Toru; Sugano, Yasushi

    2015-05-15

    Dye-decolorizing peroxidase from the basidiomycete Bjerkandera adusta Dec 1 (DyP) is a heme peroxidase. This name reflects its ability to degrade several anthraquinone dyes. The substrate specificity, the amino acid sequence, and the tertiary structure of DyP are different from those of the other heme peroxidase (super)families. Therefore, many proteins showing the similar amino acid sequences to that of DyP are called DyP-type peroxidase which is a new family of heme peroxidase identified in 2007. In fact, all structures of this family show a similar structure fold. However, this family includes many proteins whose amino acid sequence identity to DyP is lower than 15% and/or whose catalytic efficiency (kcat/Km) is a few orders of magnitude less than that of DyP. A protein showing an activity different from peroxidase activity (dechelatase activity) has been also reported. In addition, the precise physiological roles of DyP-type peroxidases are unknown. These facts raise a question of whether calling this family DyP-type peroxidase is suitable. Here, we review the differences and similarities of structure and function among this family and propose the reasonable new classification of DyP-type peroxidase family, that is, class P, I and V. In this contribution, we discuss the adequacy of this family name.

  8. Low-temperature strain gauges based on silicon whiskers

    Directory of Open Access Journals (Sweden)

    Druzhinin A. A.

    2008-08-01

    Full Text Available To create low-temperature strain gauges based on p-type silicon whiskers tensoresistive characteristics of these crystals in 4,2—300 K temperature range were studied. On the basis of p-type Si whiskers with different resistivity the strain gauges for different materials operating at cryogenic temperatures with extremely high gauge factor at 4,2 K were developed, as well as strain gauges operating at liquid helium temperatures in high magnetic fields.

  9. Characterization of thermal, optical and carrier transport properties of porous silicon using the photoacoustic technique

    Energy Technology Data Exchange (ETDEWEB)

    Sheng, Chan Kok [Department of Physics, Faculty of Science, Universiti Putra Malaysia, 43400 UPM Serdang, Selangor (Malaysia); Mahmood Mat Yunus, W. [Department of Physics, Faculty of Science, Universiti Putra Malaysia, 43400 UPM Serdang, Selangor (Malaysia)], E-mail: mahmood@science.upm.edu.my; Yunus, Wan Md. Zin Wan [Department of Chemistry, Faculty of Science, Universiti Putra Malaysia, 43400 UPM Serdang (Malaysia); Abidin Talib, Zainal [Department of Physics, Faculty of Science, Universiti Putra Malaysia, 43400 UPM Serdang, Selangor (Malaysia); Kassim, Anuar [Department of Chemistry, Faculty of Science, Universiti Putra Malaysia, 43400 UPM Serdang (Malaysia)

    2008-08-01

    In this work, the porous silicon layer was prepared by the electrochemical anodization etching process on n-type and p-type silicon wafers. The formation of the porous layer has been identified by photoluminescence and SEM measurements. The optical absorption, energy gap, carrier transport and thermal properties of n-type and p-type porous silicon layers were investigated by analyzing the experimental data from photoacoustic measurements. The values of thermal diffusivity, energy gap and carrier transport properties have been found to be porosity-dependent. The energy band gap of n-type and p-type porous silicon layers was higher than the energy band gap obtained for silicon substrate (1.11 eV). In the range of porosity (50-76%) of the studies, our results found that the optical band-gap energy of p-type porous silicon (1.80-2.00 eV) was higher than that of the n-type porous silicon layer (1.70-1.86 eV). The thermal diffusivity value of the n-type porous layer was found to be higher than that of the p-type and both were observed to increase linearly with increasing layer porosity.

  10. 11% efficient single-crystal solar cells and 10% efficient polycrystalline cells made from refined metallurgical silicon

    Science.gov (United States)

    Hanoka, J. I.; Strock, H. B.; Kotval, P. S.

    1981-09-01

    The performances of single-crystal and polycrystalline solar cells fabricated from a refined form of low-cost metallurgical silicon are presented. Czochralski-pulled single crystal and cast polycrystalline silicon solar cells with an n on p structure were made from metallurgical silicon processed by Al dissolution followed by Al removal through slagging and directional solidification to obtain material purities in the fractional ppm by weight range. For the single-crystal cells, measurements reveal AM1 efficiencies up to 11.1%, open circuit voltages up to 596 mV and fill factors up to 81%. The cast polycrystalline substrates have yielded cells with efficiencies up to 10.1%, fill factors of 79% and open circuit voltages of 585 mV. The low short circuit current densities are attributed to impurities in the base region in the single-crystal cell, and to grain boundary segregation of impurities and grain boundary recombination in the polycrystalline cells.

  11. Vacancies in defect-free zone of point-defect-controlled CZ silicon observed by low-temperature ultrasonic measurements

    Energy Technology Data Exchange (ETDEWEB)

    Yamada-Kaneta, Hiroshi [Atsugi Laboratories, Fujitsu Ltd., Morinosato-Wakamiya, Atsugi 243-0197 (Japan)]. E-mail: kaneta.hiroshi@jp.fujitsu.com; Goto, Terutaka [Graduate School of Science and Technology, Niigata University, Niigata 950-2181 (Japan); Saito, Yasuhiro [Graduate School of Science and Technology, Niigata University, Niigata 950-2181 (Japan); Nemoto, Yuichi [Graduate School of Science and Technology, Niigata University, Niigata 950-2181 (Japan); Sato, Koji [Graduate School of Science and Technology, Niigata University, Niigata 950-2181 (Japan); Kakimoto, Koichi [Research Institute for Applied Mechanics, Kyushu University, Fukuoka 816-8580 (Japan); Nakamura, Shintaro [Center for Low-Temperature Science, Tohoku University, Sendai 980-8577 (Japan)

    2006-10-15

    The low-temperature ultrasonic measurements are performed for the direct observation of the vacancies in Czochralski-grown (CZ-grown) silicon crystal. The elastic softening similar to that we recently found for the floating-zone-grown (FZ-grown) silicon crystals is observed also for the vacancy-rich region of the defect-free zone (DFZ) in the CZ silicon crystal. We further uncover that both of the interstitial-rich region in the DFZ and the region of the ring-like oxidation-induced stacking faults of the same crystal ingot exhibit no such elastic softening of detectable magnitude, confirming our previous conclusion that the defects responsible for the low-temperature softening are the vacancies. We observe how the vacancy concentration in the DFZ varies along the pulling direction.

  12. Infrared absorption and visible transparency in heavily doped p-type BaSnO3

    Science.gov (United States)

    Li, Yuwei; Sun, Jifeng; Singh, David J.

    2017-01-01

    The recent experimental work shows that perovskite BaSnO3 can be heavily doped by K to become a stable p-type semiconductor. Here, we find that p-type perovskite BaSnO3 retains transparency for visible light while absorbing strongly in the infrared below 1.5 eV. The origin of the remarkable optical transparency even with heavy doping is that the interband transitions that are enabled by empty states at the top of the valence band are concentrated mainly in the energy range from 0.5 to 1.5 eV, i.e., not extending past the near IR. In contrast to n-type, the Burstein-Moss shift is slightly negative, but very small reflecting the heavier valence bands relative to the conduction bands.

  13. Enhancement of p-type mobility in tin monoxide by native defects

    KAUST Repository

    Granato, D. B.

    2013-05-31

    Transparent p-type materials with good mobility are needed to build completely transparent p-n junctions. Tin monoxide (SnO) is a promising candidate. A recent study indicates great enhancement of the hole mobility of SnO grown in Sn-rich environment [E. Fortunato et al., Appl. Phys. Lett. 97, 052105 (2010)]. Because such an environment makes the formation of defects very likely, we study defect effects on the electronic structure to explain the increased mobility. We find that Sn interstitials and O vacancies modify the valence band, inducing higher contributions of the delocalized Sn 5p orbitals as compared to the localized O 2p orbitals, thus increasing the mobility. This mechanism of valence band modification paves the way to a systematic improvement of transparent p-type semiconductors.

  14. A Density Functional Theory Study of Doped Tin Monoxide as a Transparent p-type Semiconductor

    KAUST Repository

    Bianchi Granato, Danilo

    2012-05-01

    In the pursuit of enhancing the electronic properties of transparent p-type semiconductors, this work uses density functional theory to study the effects of doping tin monoxide with nitrogen, antimony, yttrium and lanthanum. An overview of the theoretical concepts and a detailed description of the methods employed are given, including a discussion about the correction scheme for charged defects proposed by Freysoldt and others [Freysoldt 2009]. Analysis of the formation energies of the defects points out that nitrogen substitutes an oxygen atom and does not provide charge carriers. On the other hand, antimony, yttrium, and lanthanum substitute a tin atom and donate n-type carriers. Study of the band structure and density of states indicates that yttrium and lanthanum improves the hole mobility. Present results are in good agreement with available experimental works and help to improve the understanding on how to engineer transparent p-type materials with higher hole mobilities.

  15. Comment on 'Electronic Properties of Red P-Type T12S5 Single Crystals'

    Institute of Scientific and Technical Information of China (English)

    M. Cankurtaran; H. (C)elik

    2007-01-01

    Recently, Gamal et al. [Chin. Phys. Lett. 22 (2005) 1530] reported the results of electrical conductivity, Hall effect and thermoelectric measurements on p-type Th2S5 single crystals. From the experimental data for the temperature dependence of differential thermoelectric power, Gamal et al. determined the values of 2.66 × 10-41 kg and 2.50 × 10-41 kg, respectively, for the effective masses of electrons and holes in p-type Tl2S5, which are about ten orders of magnitude smaller than the free electron mass (9.11 × 10-31 kg). We argue that the anomalously small values obtained for the effective mass of charge carriers in Tl2S5 have no physical significance.

  16. Measurement of the dead layer thickness in a p-type point contact germanium detector

    Science.gov (United States)

    Jiang, Hao; Yue, Qian; Li, Yu-Lan; Kang, Ke-Jun; Li, Yuan-Jing; Li, Jin; Lin, Shin-Ted; Liu, Shu-Kui; Ma, Hao; Ma, Jing-Lu; Su, Jian; Tsz-King Wong, Henry; Yang, Li-Tao; Zhao, Wei; Zeng, Zhi

    2016-09-01

    A 994 g mass p-type PCGe detector has been deployed during the first phase of the China Dark matter EXperiment, aiming at direct searches for light weakly interacting massive particles. Measuring the thickness of the dead layer of a p-type germanium detector is an issue of major importance since it determines the fiducial mass of the detector. This work reports a method using an uncollimated 133Ba source to determine the dead layer thickness. The experimental design, data analysis and Monte Carlo simulation processes, as well as the statistical and systematic uncertainties are described. A dead layer thickness of 1.02 mm was obtained based on a comparison between the experimental data and the simulated results. Supported by National Natural Science Foundation of China (10935005, 10945002, 11275107, 11175099)

  17. Preparation and Photovoltaic Properties of p-Type Nano-ZnFe2O4

    Institute of Scientific and Technical Information of China (English)

    LI Zi-heng; ZOU Xu; LI Gen; ZOU Guang-tian

    2012-01-01

    p-Type nano-ZnFe2O4 semiconductors were gained by high-prssure treatment.Surface photovoltaic spectrum(SPS) and transient photovoltaic technology(TPV) were used for studying the photogenerated charge of nano-ZnFe2O4.Results show that the photovoltaic behavior of nano-ZnFe2O4 changed as the processing pressure increased.When the processing pressure was higher than 2 GPa,both SPS response interval and peak changed significantly.XPS results show that the non-lattice oxygen entered into the lattice and the content of lattice oxygen increased with the increase of processing pressure.The material changed from oxygen vacancy type to oxygen excess type and the photoelectric properties changed from n-type to p-type when the processing pressure is higher than 2GPa.

  18. In and out of the cation pumps: P-type ATPase structure revisited

    DEFF Research Database (Denmark)

    Bublitz, Maike; Poulsen, Hanne; Morth, Jens Preben

    2010-01-01

    Active transport across membranes is a crucial requirement for life. P-type ATPases build up electrochemical gradients at the expense of ATP by forming and splitting a covalent phosphoenzyme intermediate, coupled to conformational changes in the transmembrane section where the ions are translocated....... The marked increment during the last three years in the number of crystal structures of P-type ATPases has greatly improved our understanding of the similarities and differences of pumps with different ion specificities, since the structures of the Ca2+-ATPase, the Na+,K+-ATPase and the H+-ATPase can now...... be compared directly. Mechanisms for ion gating, charge neutralization and backflow prevention are starting to emerge from comparative structural analysis; and in combination with functional studies of mutated pumps this provides a framework for speculating on how the ions are bound and released as well...

  19. Perspectives of High-Temperature Thermoelectric Applications and p-type and n-type Aluminoborides

    Science.gov (United States)

    Mori, T.

    2016-10-01

    A need exists to develop high-temperature thermoelectric materials which can utilize high-temperature unutilized/waste heat in thermal power plants, steelworks, factories, incinerators, etc., and also focused solar power. The thermal power plant topping application is of potential high impact since it can sizably increase the efficiency of power plants which are the major supply of electrical power for many countries. Higher borides are possible candidates for their particular high-temperature stability, generally large Seebeck coefficients, α, and intrinsic low thermal conductivity. Excellent (|α| > 200 μV/K) p-type or n-type behavior was recently achieved in the aluminoboride YAl x B14 by varying the occupancy of Al sites, x. Finding p-type and n-type counterparts has long been a difficulty of thermoelectric research not limited to borides. This paper reviews possible high-temperature thermoelectric applications, and recent developments and perspectives of thermoelectric aluminoborides.

  20. CALCULATING THE HABITABLE ZONE OF BINARY STAR SYSTEMS. II. P-TYPE BINARIES

    Energy Technology Data Exchange (ETDEWEB)

    Haghighipour, Nader [Institute for Astronomy and NASA Astrobiology Institute, University of Hawaii-Manoa, Honolulu, HI 96822 (United States); Kaltenegger, Lisa [MPIA, Koenigstuhl 17, Heidelberg, D-69117 (Germany)

    2013-11-10

    We have developed a comprehensive methodology for calculating the circumbinary habitable zone (HZ) in planet-hosting P-type binary star systems. We present a general formalism for determining the contribution of each star of the binary to the total flux received at the top of the atmosphere of an Earth-like planet and use the Sun's HZ to calculate the inner and outer boundaries of the HZ around a binary star system. We apply our calculations to the Kepler's currently known circumbinary planetary systems and show the combined stellar flux that determines the boundaries of their HZs. We also show that the HZ in P-type systems is dynamic and, depending on the luminosity of the binary stars, their spectral types, and the binary eccentricity, its boundaries vary as the stars of the binary undergo their orbital motion. We present the details of our calculations and discuss the implications of the results.

  1. Excimer laser annealing: A gold process for CZ silicon junction formation

    Science.gov (United States)

    Wong, David C.; Bottenberg, William R.; Byron, Stanley; Alexander, Paul

    A cold process using an excimer laser for junction formation in silicon has been evaluated as a way to avoid problems associated with thermal diffusion. Conventional thermal diffusion can cause bulk precipitation of SiOx and SiC or fail to completely activate the dopant, leaving a degenerate layer at the surface. Experiments were conducted to determine the feasibility of fabricating high quality p-n junctions using a pulsed excimer laser for junction formation at remelt temperature with ion-implanted surfaces. Solar-cell efficiency exceeding 16 percent was obtained using Czochralski single-crystal silicon without benefit of back surface field or surface passivation. Characterization shows that the formation of uniform, shallow junctions (approximately 0.25 micron) by excimer laser scanning preserves the minority carrier lifetime that leads to high current collection. However, the process is sensitive to initial surface conditions and handling parameters that drive the cost up.

  2. Analysis of Testbeam Data of Irradiated Silicon Prototype Sensors for the CMS Tracker Upgrade

    CERN Document Server

    Auzinger, Georg

    2013-01-01

    A large number of 6 inch wafers made from p and n-type, float zone, Magnetic Czochralski and Epitaxial Silicon in thicknesses ranging from 50 to 320 $\\mu m$ were ordered from Hamamatsu. The wafers contain many different test structures as well as strip sensors called Multi Geometry Silicon Strip Detector (MSSD), that feature pitches from 70 to 240 $\\mu m$ and different strip widths. The structures were irradiated to a fluence of $1.5$ $\\times$ $10^{15}$ $1MeV$ $N_{eq}\\ cm^{-2}$ which corresponds to the fluence that the sensors will receive in a future Tracker at a distance of 20 centimeters from the beam. This contribution will focus on the results obtained in various test beams with these strip sensors. The evolution of parameters such as resolution, signal and noise with increasing fluences will be addressed as well as the relation between geometry, thickness and technology.

  3. Electrically active light-element complexes in silicon crystals grown by cast method

    Science.gov (United States)

    Sato, Kuniyuki; Ogura, Atsushi; Ono, Haruhiko

    2016-09-01

    Electrically active light-element complexes called thermal donors and shallow thermal donors in silicon crystals grown by the cast method were studied by low-temperature far-infrared absorption spectroscopy. The relationship between these complexes and either crystal defects or light-element impurities was investigated by comparing different types of silicon crystals, that is, conventional cast-grown multicrystalline Si, seed-cast monolike-Si, and Czochralski-grown Si. The dependence of thermal and the shallow thermal donors on the light-element impurity concentration and their annealing behaviors were examined to compare the crystals. It was found that crystal defects such as dislocations and grain boundaries did not affect the formation of thermal or shallow thermal donors. The formation of these complexes was dominantly affected by the concentration of light-element impurities, O and C, independent of the existence of crystal defects.

  4. Mechanisms limiting the performance of large grain polycrystalline silicon solar cells

    Science.gov (United States)

    Culik, J. S.; Alexander, P.; Dumas, K. A.; Wohlgemuth, J. W.

    1984-01-01

    The open-circuit voltage and short-circuit current of large-grain (1 to 10 mm grain diameter) polycrystalline silicon solar cells is determined by the minority-carrier diffusion length within the bulk of the grains. This was demonstrated by irradiating polycrystalline and single-crystal (Czochralski) silicon solar cells with 1 MeV electrons to reduce their bulk lifetime. The variation of short-circuit current with minority-carrier diffusion length for the polycrystalline solar cells is identical to that of the single-crystal solar cells. The open-circuit voltage versus short-circuit current characteristic of the polycrystalline solar cells for reduced diffusion lengths is also identical to that of the single-crystal solar cells. The open-circuit voltage of the polycrystalline solar cells is a strong function of quasi-neutral (bulk) recombination, and is reduced only slightly, if at all, by grain-boundary recombination.

  5. Plasma texturing on large-area industrial grade CZ silicon solar cells

    DEFF Research Database (Denmark)

    Davidsen, Rasmus Schmidt; Nordseth, Ørnulf; Boisen, Anja

    2013-01-01

    We report on an experimental study of nanostructuring of silicon solar cells using reactive ion etching (RIE). A simple mask-less, scalable RIE nanostructuring of the solar cell surface is shown to reduce the AM1.5-weighted average reflectance to a level below 1 % in a fully optimized RIE texturing......-mono-crystalline Si. The process was successfully integrated in fabrication of solar cells using only industry standard processes on a Czochralski (CZ) silicon starting material. The resulting cell performance was compared to cells with conventional texturing. For cells, where the nanostructuring was not fully......, and thus holds a significant potential for improvement of the cell performance compared to current industrial standards. The reflectance is shown to remain below that of conventional textured cells also at high angle of incidence. The process is shown to be equally applicable to mono-, multi- and quasi...

  6. Thermal recrystallization of physical vapor deposition based germanium thin films on bulk silicon (100)

    KAUST Repository

    Hussain, Aftab M.

    2013-08-16

    We demonstrate a simple, low-cost, and scalable process for obtaining uniform, smooth surfaced, high quality mono-crystalline germanium (100) thin films on silicon (100). The germanium thin films were deposited on a silicon substrate using plasma-assisted sputtering based physical vapor deposition. They were crystallized by annealing at various temperatures ranging from 700 °C to 1100 °C. We report that the best quality germanium thin films are obtained above the melting point of germanium (937 °C), thus offering a method for in-situ Czochralski process. We show well-behaved high-κ /metal gate metal-oxide-semiconductor capacitors (MOSCAPs) using this film. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  7. Bifurcation of thermocapillary convection in a shallow annular pool of silicon melt

    Institute of Scientific and Technical Information of China (English)

    Yourong Li; Lan Peng; Shuangying Wu; Nobuyuki Imaishi

    2007-01-01

    In order to understand the nature ofsurface patterns on silicon melts in industrial Czochral-ski furnaces,we conducted a series of unsteady three-dimensional numerical simulations of thermocapillaryconvections in thin silicon melt pools in an annular con-tainer.The pool is heated from the outer cylindrical walland cooled at the inner wall.Bottom and top surfacesare adiabatic.The results show that the flow is steadyand axisymmetric at small temperature difference inthe radial direction.When the temperature differenceexceeds a certain threshold value,hydrothermal wavesappear and bifurcation occurs.In this case,the flow is un-steady and there are two possible groups of hydrother-mal waves with different number of waves,which arecharacterized by spoke patterns traveling in the clock-wise and counter-clockwise directions.Details of theflow and temperature disturbances are discussed andnumber of waves and traveling velocity of the hydro-thermal wave are determined.

  8. Sensitization of p-type NiO using n-type conducting polymers

    NARCIS (Netherlands)

    Chavhan, S.D.; Abellon, R.D.; Breemen, A.J.J.M. van; Koetse, M.M.; Sweelssen, J.; Savenije, T.J.

    2010-01-01

    We report on the sensitization of a p-type inorganic semiconductor, NiO, by n-type conjugated polymers. NiO thin films were deposited using RF sputtering in pure Ar (NiO A) or in Ar + O2 (90% + 10%) (NiO B). XPS and Kelvin probe measurements indicate the incorporation of oxygen in NiO B

  9. Sensitization of p-type NiO using n-type conducting polymers

    NARCIS (Netherlands)

    Chavhan, S.D.; Abellon, R.D.; Breemen, A.J.J.M. van; Koetse, M.M.; Sweelssen, J.; Savenije, T.J.

    2010-01-01

    We report on the sensitization of a p-type inorganic semiconductor, NiO, by n-type conjugated polymers. NiO thin films were deposited using RF sputtering in pure Ar (NiO A) or in Ar + O2 (90% + 10%) (NiO B). XPS and Kelvin probe measurements indicate the incorporation of oxygen in NiO B l

  10. Investigation of negative photoconductivity in p-type Pb1-xSnxTe film

    Science.gov (United States)

    Tavares, M. A. B.; da Silva, M. J.; Peres, M. L.; de Castro, S.; Soares, D. A. W.; Okazaki, A. K.; Fornari, C. I.; Rappl, P. H. O.; Abramof, E.

    2017-01-01

    We investigated the negative photoconductivity (NPC) effect that was observed in a p-type Pb1-xSnxTe film for temperatures varying from 300 K down to 85 K. We found that this effect is a consequence of defect states located in the bandgap which act as trapping levels, changing the relation between generation and recombination rates. Theoretical calculations predict contributions to the NPC from both conduction and valence bands, which are in accordance with the experimental observations.

  11. Sensitization of p-type NiO using n-type conducting polymers

    NARCIS (Netherlands)

    Chavhan, S.D.; Abellon, R.D.; Breemen, A.J.J.M. van; Koetse, M.M.; Sweelssen, J.; Savenije, T.J.

    2010-01-01

    We report on the sensitization of a p-type inorganic semiconductor, NiO, by n-type conjugated polymers. NiO thin films were deposited using RF sputtering in pure Ar (NiO A) or in Ar + O2 (90% + 10%) (NiO B). XPS and Kelvin probe measurements indicate the incorporation of oxygen in NiO B l

  12. Radiation damage studies of multi-guard ring p-type bulk diodes

    CERN Document Server

    Bortoletto, D; Günther, M; Grim, G P; Lander, R L; Willard, S; Li, Z

    1999-01-01

    Several diodes with different multi-guard ring structures were fabricated from 10 k OMEGA cm p-type bulk material. Studies on the performance of such devices are presented here. They include the measurement of the leakage current, breakdown voltage and charge collection efficiency before and after 2x10 sup 1 sup 4 p/cm sup 2 irradiation with 63.3 MeV kinetic protons. (author)

  13. Method for producing high carrier concentration p-Type transparent conducting oxides

    Science.gov (United States)

    Li, Xiaonan; Yan, Yanfa; Coutts, Timothy J.; Gessert, Timothy A.; Dehart, Clay M.

    2009-04-14

    A method for producing transparent p-type conducting oxide films without co-doping plasma enhancement or high temperature comprising: a) introducing a dialkyl metal at ambient temperature and a saturated pressure in a carrier gas into a low pressure deposition chamber, and b) introducing NO alone or with an oxidizer into the chamber under an environment sufficient to produce a metal-rich condition to enable NO decomposition and atomic nitrogen incorporation into the formed transparent metal conducting oxide.

  14. Effect of Subgrains on the Performance of Mono-Like Crystalline Silicon Solar Cells

    Directory of Open Access Journals (Sweden)

    Su Zhou

    2013-01-01

    Full Text Available The application of Czochralski (Cz monocrystalline silicon material in solar cells is limited by its high cost and serious light-induced degradation. The use of cast multicrystalline silicon is also hindered by its high dislocation densities and high surface reflectance after texturing. Mono-like crystalline silicon is a promising material because it has the advantages of both mono- and multicrystalline silicon. However, when mono-like wafers are made into cells, the efficiencies of a batch of wafers often fluctuate within a wide range of >1% (absolute. In this work, mono-like wafers are classified by a simple process and fabricated into laser doping selective emitter cells. The effect and mechanism of subgrains on the performance of mono-like crystalline silicon solar cells are studied. The results show that the efficiency of mono-like crystalline silicon solar cells significantly depends on material defects that appear as subgrains on an alkaline textured surface. These subgrains have an almost negligible effect on the optical performance, shunt resistance, and junction recombination but significantly affect the minority carrier diffusion length and quantum efficiency within a long wavelength range. Finally, an average efficiency of 18.2% is achieved on wafers with hardly any subgrain but with a small-grain band.

  15. Record mobility in transparent p-type tin monoxide films and devices by phase engineering

    KAUST Repository

    Caraveo-Frescas, Jesus Alfonso

    2013-06-25

    Here, we report the fabrication of nanoscale (15 nm) fully transparent p-type SnO thin film transistors (TFT) at temperatures as low as 180 C with record device performance. Specifically, by carefully controlling the process conditions, we have developed SnO thin films with a Hall mobility of 18.71 cm2 V-1 s-1 and fabricated TFT devices with a linear field-effect mobility of 6.75 cm2 V-1 s -1 and 5.87 cm2 V-1 s-1 on transparent rigid and translucent flexible substrates, respectively. These values of mobility are the highest reported to date for any p-type oxide processed at this low temperature. We further demonstrate that this high mobility is realized by careful phase engineering. Specifically, we show that phase-pure SnO is not necessarily the highest mobility phase; instead, well-controlled amounts of residual metallic tin are shown to substantially increase the hole mobility. A detailed phase stability map for physical vapor deposition of nanoscale SnO is constructed for the first time for this p-type oxide. © 2013 American Chemical Society.

  16. Electronic inhomogeneity in n- and p-type PbTe detected by 125Te NMR

    Science.gov (United States)

    Levin, E. M.; Heremans, J. P.; Kanatzidis, M. G.; Schmidt-Rohr, K.

    2013-09-01

    125Te nuclear magnetic resonance spectra and spin-lattice relaxation of n- and p-type PbTe, self-doping narrow band-gap semiconductors, have been studied and compared to those of p-type GeTe. Spin-lattice relaxation in GeTe can be fit by one component, while that in both PbTe samples must be fit by at least two components, showing electronically homogeneous and inhomogeneous materials, respectively. For PbTe-based materials, the spin-lattice relaxation rate 1/T1 increases linearly with carrier concentration. The data for GeTe fall on the same line and allow us to extend this plot to higher concentrations. Long and short T1 components in both PbTe samples reflect “low,” ˜1017 cm-3, and “high,” ˜1018 cm-3, carrier concentration components. Carrier concentrations in both n- and p-type PbTe samples obtained from the Hall and Seebeck effects generally match the “high” carrier concentration component, and to some extent, ignore the “low” one. This demonstrates that the Hall and Seebeck effects may have a limited ability for the determination of carrier concentration in complex thermoelectric PbTe-based and other multicomponent materials.

  17. Effective p-type N-doped WS{sub 2} monolayer

    Energy Technology Data Exchange (ETDEWEB)

    Zhao, Xu, E-mail: zhaoxu@htu.cn; Xia, Congxin; Wang, Tianxing; Peng, Yuting; Dai, Xianqi

    2015-11-15

    Based on density functional theory, the characteristics of n- and p-type dopants are investigated by means of group V and VII atoms substituting sulfur in the WS{sub 2} monolayer. Numerical results show that for each doping case, the formation energy is lower under W-rich condition, which indicates that it is energy favorable to incorporate group V and VII atoms into WS{sub 2} under W-rich experimental conditions. Moreover, compared with other dopant cases, N-doped WS{sub 2} monolayer owns the lowest formation energy. In particular, the transition level of (−1/0) is only 75 meV in the N-doped case, which indicates that N impurities can offer effective p-type carriers in the WS{sub 2} monolayer. - Highlights: • The formation energy is lower under W-rich conditions. • N-doped system owns the lowest formation energy compared with other atoms. • The transition level of N-doping in WS{sub 2} is 75 meV. • N impurities can offer effective p-type carriers in the WS{sub 2}.

  18. Demethoxycurcumin Is A Potent Inhibitor of P-Type ATPases from Diverse Kingdoms of Life.

    Science.gov (United States)

    Dao, Trong Tuan; Sehgal, Pankaj; Tung, Truong Thanh; Møller, Jesper Vuust; Nielsen, John; Palmgren, Michael; Christensen, Søren Brøgger; Fuglsang, Anja Thoe

    2016-01-01

    P-type ATPases catalyze the active transport of cations and phospholipids across biological membranes. Members of this large family are involved in a range of fundamental cellular processes. To date, a substantial number of P-type ATPase inhibitors have been characterized, some of which are used as drugs. In this work a library of natural compounds was screened and we first identified curcuminoids as plasma membrane H+-ATPases inhibitors in plant and fungal cells. We also found that some of the commercial curcumins contain several curcuminoids. Three of these were purified and, among the curcuminoids, demethoxycurcumin was the most potent inhibitor of all tested P-type ATPases from fungal (Pma1p; H+-ATPase), plant (AHA2; H+-ATPase) and animal (SERCA; Ca2+-ATPase) cells. All three curcuminoids acted as non-competitive antagonist to ATP and hence may bind to a highly conserved allosteric site of these pumps. Future research on biological effects of commercial preparations of curcumin should consider the heterogeneity of the material.

  19. Enhanced thermopower and low thermal conductivity in p-type polycrystalline ZrTe5

    Science.gov (United States)

    Hooda, M. K.; Yadav, C. S.

    2017-07-01

    Thermoelectric properties of polycrystalline p-type ZrTe5 are reported in the temperature (T) range of 2-340 K. Thermoelectric power (S) is positive and reaches up to 458 μV/K at 340 K on increasing T. The value of Fermi energy 16 meV suggests a low carrier density of ≈9.5 × 1018 cm-3. A sharp anomaly in S data is observed at 38 K, which seems intrinsic to p-type ZrTe5. The thermal conductivity (κ) value is low (2 W/m K at T = 300 K) with major contribution from the lattice part. Electrical resistivity data show the metal to semiconductor transition at T ˜ 150 K and non-Arrhenius behavior in the semiconducting region. The figure of merit zT (0.026 at T = 300 K) is ˜63% higher than that of HfTe5 (0.016) and better than those of the conventional SnTe, p-type PbTe, and bipolar pristine ZrTe5 compounds.

  20. Efficient synthesis of triarylamine-based dyes for p-type dye-sensitized solar cells

    Science.gov (United States)

    Wild, Martin; Griebel, Jan; Hajduk, Anna; Friedrich, Dirk; Stark, Annegret; Abel, Bernd; Siefermann, Katrin R.

    2016-05-01

    The class of triarylamine-based dyes has proven great potential as efficient light absorbers in inverse (p-type) dye sensitized solar cells (DSSCs). However, detailed investigation and further improvement of p-type DSSCs is strongly hindered by the fact that available synthesis routes of triarylamine-based dyes are inefficient and particularly demanding with regard to time and costs. Here, we report on an efficient synthesis strategy for triarylamine-based dyes for p-type DSSCs. A protocol for the synthesis of the dye-precursor (4-(bis(4-bromophenyl)amino)benzoic acid) is presented along with its X-ray crystal structure. The dye precursor is obtained from the commercially available 4(diphenylamino)benzaldehyde in a yield of 87% and serves as a starting point for the synthesis of various triarylamine-based dyes. Starting from the precursor we further describe a synthesis protocol for the dye 4-{bis[4‧-(2,2-dicyanovinyl)-[1,1‧-biphenyl]-4-yl]amino}benzoic acid (also known as dye P4) in a yield of 74%. All synthesis steps are characterized by high yields and high purities without the need for laborious purification steps and thus fulfill essential requirements for scale-up.

  1. Si-C Linked Organic Monolayers on Crystalline Silicon Surfaces as Alternative Gate Insulators

    NARCIS (Netherlands)

    Faber, Erik J.; Smet, de Louis C.P.M.; Olthuis, Wouter; Zuilhof, Han; Sudhölter, Ernst J.R.; Bergveld, Piet; Berg, van den Albert

    2005-01-01

    Herein, the influence of silicon surface modification via Si-CnH2n+1 (n=10,12,16,22) monolayer-based devices on p-type (100) and n-type (100) silicon is studied by forming MIS (metal–insulator–semiconductor) diodes using a mercury probe. From current density–voltage (J–V) and capacitance–voltage (C–

  2. Crystal growth by Bridgman and Czochralski method of the ferromagnetic quantum critical material YbNi4P2

    Science.gov (United States)

    Kliemt, K.; Krellner, C.

    2016-09-01

    The tetragonal YbNi4P2 is one of the rare examples of compounds that allow the investigation of a ferromagnetic quantum critical point. We report in detail on two different methods which have been used to grow YbNi4P2 single crystals from a self-flux. The first, a modified Bridgman method, using a closed crucible system yields needle-shaped single crystals oriented along the [001]-direction. The second method, the Czochralski growth from a levitating melt, yields large single crystals which can be cut in any desired orientation. With this crucible-free method, samples without flux inclusions and a resistivity ratio at 1.8 K of RR1.8K = 17 have been grown.

  3. Crystal front shape control by use of an additional heater in a Czochralski sapphire single crystal growth system

    Science.gov (United States)

    Hur, Min-Jae; Han, Xue-Feng; Choi, Ho-Gil; Yi, Kyung-Woo

    2017-09-01

    The quality of sapphire single crystals used as substrates for LED production is largely influenced by two defects: dislocation density and bubbles trapped in the crystal. In particular, the dislocation density has a higher value in sapphire grown by the Czochralski (CZ) method than by other methods. In the present study, we predict a decreased value for the convexity and thermal gradient at the crystal front (CF) through the use of an additional heater in an induction-heated CZ system. In addition, we develop a solute concentration model by which the location of bubble formation in CZ growth is calculated, and the results are compared with experimental results. We further calculate the location of bubble entrapment corresponding with the use of an additional heater. We find that sapphire crystal growth with an additional heater yields a decreased thermal gradient at the CF, together with decreased CF convexity, improved energy efficiency, and improvements in terms of bubble formation location.

  4. Periodically poled lithium niobate structures grown by the off-center Czochralski technique for backward and forward second harmonic generation

    Science.gov (United States)

    Argiolas, N.; Bazzan, M.; Cattaruzza, E.; Gasparini, A.; Mazzoldi, P.; Sada, C.; Capobianco, A. D.; Autizi, E.; Pigozzo, F. M.; Locatelli, A.; Guarneri, L. C.

    2007-03-01

    We report on the characterization of periodically poled lithium niobate structures grown by the off-center Czochralski technique with periods ranging between 2 and 10 μm. The domains distribution along the crystal was inspected by a profilometer scan after etching the structures and carrying a suitable data processing. The second harmonic generation efficiency was predicted by numerically integrating the governing equations through to a recently proposed nonlinear bidirectional beam propagation method. The numerical analysis pointed out the feasibility of the backward second harmonic generation in the sample with the shortest domain period. The predicted second harmonic generation efficiency was finally corrected considering the phase shifts induced in the second harmonic wave by the presence of different sized domains.

  5. Temperature-Dependent Galvanomagnetic Measurements on Doped InSb and InAs Grown by Liquid Encapsulated Czochralski

    Institute of Scientific and Technical Information of China (English)

    M. Kasap; S. Acar; S. (O)z(c)elik; S. Karadeniz2; N. Tu(g)luo(g)lu

    2005-01-01

    @@ Resistivity, magnetoresistivity and Hall effect measurements in n-type Te-doped InSb and S-doped InAs samples grown by the liquid encapsulated Czochralski technique were carried out as a function of temperature (14-350 K) and magnetic field (0-1.35 T). In Te-doped InSb, an impurity level with energy E1 -= 3 meV and the activation energy Eo =- 0.26 eV, which is the band gap energy, are obtained from the resistivity and Hall carrier concentration analysis. In S-doped InAs, both the linear and power law models are used in explaining the temperature-dependent resistivity. The effects of impurities on the electron and magnetic transportation properties of InAs and InSb have also been discussed.

  6. Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B(CH33

    Directory of Open Access Journals (Sweden)

    Sergej Alexandrovich Filonovich, Hugo Águas, Tito Busani, António Vicente, Andreia Araújo, Diana Gaspar, Marcia Vilarigues, Joaquim Leitão, Elvira Fortunato and Rodrigo Martins

    2012-01-01

    Full Text Available We have characterized the structure and electrical properties of p-type nanocrystalline silicon films prepared by radio-frequency plasma-enhanced chemical vapor deposition and explored optimization methods of such layers for potential applications in thin-film solar cells. Particular attention was paid to the characterization of very thin (~20 nm films. The cross-sectional morphology of the layers was studied by fitting the ellipsometry spectra using a multilayer model. The results suggest that the crystallization process in a high-pressure growth regime is mostly realized through a subsurface mechanism in the absence of the incubation layer at the substrate-film interface. Hydrogen plasma treatment of a 22-nm-thick film improved its electrical properties (conductivity increased more than ten times owing to hydrogen insertion and Si structure rearrangements throughout the entire thickness of the film.

  7. Field effect passivation of high efficiency silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Aberle, A.G. (Fraunhofer-Inst. fuer Solare Energiesysteme (ISE), Freiburg (Germany)); Glunz, S. (Fraunhofer-Inst. fuer Solare Energiesysteme (ISE), Freiburg (Germany)); Warta, W. (Fraunhofer-Inst. fuer Solare Energiesysteme (ISE), Freiburg (Germany))

    1993-03-01

    In this paper effective surface recombination velocities S[sub eff] at the rear Si-SiO[sub 2] interface of the presently best one-sun silicon solar cell structure are calculated on the basis of measured oxide parameters. A new cell design is proposed allowing for a control of the surface space charge region by a gate voltage. It is shown that the electric field introduced by the positive fixed oxide charge density typically found at thermally oxidized silicon surfaces and the favorable work function difference between the gate metal aluminum and silicon leads to a reduction of S[sub eff] to values well below 1 cm/s at AM1.5 illumination for n-type as well as p-type silicon. At low illumination levels, however, oxidized n-type silicon has much better surface passivation properties than p-type silicon due to the small hole capture cross section ([sigma][sub n]/[sigma][sub p][approx]1000 at midgap). Only at small illumination intensities for p-type substrates or in the case of poor Si-SiO[sub 2] interface quality the incorporation of a gate electrode on the rear surface is a promising tool for further reducing surface recombination losses. (orig.)

  8. Highly sensitive wide bandwidth photodetector based on internal photoemission in CVD grown p-type MoS2/graphene Schottky junction.

    Science.gov (United States)

    Vabbina, PhaniKiran; Choudhary, Nitin; Chowdhury, Al-Amin; Sinha, Raju; Karabiyik, Mustafa; Das, Santanu; Choi, Wonbong; Pala, Nezih

    2015-07-22

    Two dimensional (2D) Molybdenum disulfide (MoS2) has evolved as a promising material for next generation optoelectronic devices owing to its unique electrical and optical properties, such as band gap modulation, high optical absorption, and increased luminescence quantum yield. The 2D MoS2 photodetectors reported in the literature have presented low responsivity compared to silicon based photodetectors. In this study, we assembled atomically thin p-type MoS2 with graphene to form a MoS2/graphene Schottky photodetector where photo generated holes travel from graphene to MoS2 over the Schottky barrier under illumination. We found that the p-type MoS2 forms a Schottky junction with graphene with a barrier height of 139 meV, which results in high photocurrent and wide spectral range of detection with wavelength selectivity. The fabricated photodetector showed excellent photosensitivity with a maximum photo responsivity of 1.26 AW(-1) and a noise equivalent power of 7.8 × 10(-12) W/√Hz at 1440 nm.

  9. In-Situ Characterization of Potential-Induced Degradation in Crystalline Silicon Photovoltaic Modules Through Dark I–V Measurements

    Energy Technology Data Exchange (ETDEWEB)

    Luo, Wei; Hacke, Peter; Singh, Jai Prakash; Chai, Jing; Wang, Yan; Ramakrishna, Seeram; Aberle, Armin G.; Khoo, Yong Sheng

    2017-01-01

    A temperature correction methodology for in-situ dark I-V(DIV) characterization of conventional p-type crystalline silicon photovoltaic (PV) modules undergoing potential-induced degradation (PID) is proposed.

  10. Patterned growth of high aspect ratio silicon wire arrays at moderate temperature

    Science.gov (United States)

    Morin, Christine; Kohen, David; Tileli, Vasiliki; Faucherand, Pascal; Levis, Michel; Brioude, Arnaud; Salem, Bassem; Baron, Thierry; Perraud, Simon

    2011-04-01

    High aspect ratio silicon wire arrays with excellent pattern fidelity over wafer-scale area were grown by chemical vapor deposition at moderate temperature, using a gas mixture of silane and hydrogen chloride. An innovative two-step process was developed for in situ doping of silicon wires by diborane. This process led to high p-type doping levels, up to 10 18-10 19 cm -3, without degradation of the silicon wire array pattern fidelity.

  11. Improvement of minority carrier life time in N-type monocrystalline Si by the Czochralski method

    Science.gov (United States)

    Baik, Sungsun; Pang, Ilsun; Kim, Jaemin; Kim, Kwanghun

    2016-07-01

    The installation amount of solar power plants increases every year. Multi-crystalline Si solar cells comprise a large share of the market of solar power plants. Multi-crystalline and single-crystalline Si solar cells are competing against one another in the market. Many single-crystalline companies are trying to develop and produce n-type solar cells with higher cell efficiency than that of p-type. In n-type wafers with high cell efficiency, wafer quality has become increasingly important. In order to make ingots with higher MCLT, the effects of both poly types related to metal impurities and pull speeds related to vacancy concentration on minority carrier life time were studied. In the final part of ingots, poly types related to the metal impurities are a dominant factor on MCLT. In the initial part of ingots, pull speeds related to vacancy concentration are a dominant factor on MCLT. [Figure not available: see fulltext.

  12. Ivermectin is a nonselective inhibitor of mammalian P-type ATPases.

    Science.gov (United States)

    Pimenta, Paulo Henrique Cotrim; Silva, Claudia Lucia Martins; Noël, François

    2010-02-01

    Ivermectin is a large spectrum antiparasitic drug that is very safe at the doses actually used. However, as it is being studied for new applications that would require higher doses, we should pay attention to its effects at high concentrations. As micromolar concentrations of ivermectin have been reported to inhibit the sarco-endoplasmic reticulum Ca(2+)-ATPase (SERCA), we decided to investigate its putative inhibitory effect on other two important P-type ATPases, namely the Na(+) , K(+)-ATPase and H(+)/K(+)-ATPase. We first extended the data on SERCA, using preparations from rat enriched in SERCA1a (extensor digitorum longus) and 1b (heart) isoforms. Secondly, we tested the effect of ivermectin in two preparations of rat Na(+), K(+)-ATPase in order to appreciate its putative selectivity towards the alpha(1) isoform (kidney) and the alpha(2)/alpha(3) isoforms (brain), and in an H(+)/K(+)-ATPase preparation from rat stomach. Ivermectin inhibited all these ATPases with similar IC(50) values (6-17 microM). With respect to the inhibition of the Na(+), K(+)-ATPase, ivermectin acts by a mechanism different from the classical cardiac glycosides, based on selectivity towards the isoforms, sensibility to the antagonistic effect of K(+) and to ionic conditions favoring different conformations of the enzyme. We conclude that ivermectin is a nonselective inhibitor of three important mammalian P-type ATPases, which is indicative of putative important adverse effects if this drug were used at high doses. As a consequence, we propose that novel analogs of ivermectin should be developed and tested both for their parasitic activity and in vitro effects on P-type ATPases.

  13. Enhanced photovoltaic effect of ruthenium complex-modified graphene oxide with P-type conductivity

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Wei, E-mail: jj_zw_js@sina.com.cn; Bai, Huicong; Zhang, Yu; Sun, Ying; Lin, Shen; Liu, Jian; Yang, Qi; Song, Xi-Ming, E-mail: songlab@lnu.edu.cn

    2014-10-15

    A graphene oxide nanocomposite with bis(1,10-phenanthroline)(N-(2-aminoethyl)-4-(4-methyl-2,2-bipyridine-4-yl) formamide) ruthenium (Ru(phen){sub 2}(bpy-NH{sub 2})(PF{sub 6}){sub 2}), a ruthenium complex, was synthesized by amidation reaction between amino group of the ruthenium complex and carboxyl group of GO. The as-prepared Ru(II)–GO composite was characterized by infrared (IR) spectroscopy, X-ray photoelectron spectroscopy (XPS), ultraviolet–visible (UV–Vis) absorption spectra, fluorescence spectra, surface photovoltage (SPV) spectrum and transient photovoltage (TPV) technology. This nanocomposite showed a typical p-type character and an enhanced photovoltaic effect at long timescale of about 3 × 10{sup −3} s compared to GO alone. A reversible rise/decay of the photocurrent in response to the on/off illumination step was also observed in a photoelectrochemical cell of the Ru(II)–GO composite. The photocurrent response of the Ru(II)–GO film was remarkably higher than that of GO film. Therefore, this Ru(II)–GO composite is believed to be a promising p-type photoelectric conversion material for further photovoltaic applications. - Highlights: • A new dye-sensitized graphene oxide nanocomposite was reported. • A photo-induced charge transfer process in this nanocomposite was confirmed. • This composite showed a typical p-type conductivity. • This composite showed an enhanced photovoltaic effect at a long timescale.

  14. Electroforming-free resistive switching memory effect in transparent p-type tin monoxide

    KAUST Repository

    Hota, M. K.

    2014-04-14

    We report reproducible low bias bipolar resistive switching behavior in p-type SnO thin film devices without extra electroforming steps. The experimental results show a stable resistance ratio of more than 100 times, switching cycling performance up to 180 cycles, and data retention of more than 103 s. The conduction mechanism varied depending on the applied voltage range and resistance state of the device. The memristive switching is shown to originate from a redox phenomenon at the Al/SnO interface, and subsequent formation/rupture of conducting filaments in the bulk of the SnO layer, likely involving oxygen vacancies and Sn interstitials.

  15. Does p-type ohmic contact exist in WSe2-metal interfaces?

    Science.gov (United States)

    Wang, Yangyang; Yang, Ruo Xi; Quhe, Ruge; Zhong, Hongxia; Cong, Linxiao; Ye, Meng; Ni, Zeyuan; Song, Zhigang; Yang, Jinbo; Shi, Junjie; Li, Ju; Lu, Jing

    2015-12-01

    Formation of low-resistance metal contacts is the biggest challenge that masks the intrinsic exceptional electronic properties of two dimensional WSe2 devices. We present the first comparative study of the interfacial properties between monolayer/bilayer (ML/BL) WSe2 and Sc, Al, Ag, Au, Pd, and Pt contacts by using ab initio energy band calculations with inclusion of the spin-orbital coupling (SOC) effects and quantum transport simulations. The interlayer coupling tends to reduce both the electron and hole Schottky barrier heights (SBHs) and alters the polarity for the WSe2-Au contact, while the SOC chiefly reduces the hole SBH. In the absence of the SOC, the Pd contact has the smallest hole SBH. Dramatically, the Pt contact surpasses the Pd contact and becomes the p-type ohmic or quasi-ohmic contact with inclusion of the SOC. Therefore, p-type ohmic or quasi-ohmic contact exists in WSe2-metal interfaces. Our study provides a theoretical foundation for the selection of favorable metal electrodes in ML/BL WSe2 devices.Formation of low-resistance metal contacts is the biggest challenge that masks the intrinsic exceptional electronic properties of two dimensional WSe2 devices. We present the first comparative study of the interfacial properties between monolayer/bilayer (ML/BL) WSe2 and Sc, Al, Ag, Au, Pd, and Pt contacts by using ab initio energy band calculations with inclusion of the spin-orbital coupling (SOC) effects and quantum transport simulations. The interlayer coupling tends to reduce both the electron and hole Schottky barrier heights (SBHs) and alters the polarity for the WSe2-Au contact, while the SOC chiefly reduces the hole SBH. In the absence of the SOC, the Pd contact has the smallest hole SBH. Dramatically, the Pt contact surpasses the Pd contact and becomes the p-type ohmic or quasi-ohmic contact with inclusion of the SOC. Therefore, p-type ohmic or quasi-ohmic contact exists in WSe2-metal interfaces. Our study provides a theoretical foundation for

  16. Initial results from 3D-DDTC detectors on p-type substrates

    Energy Technology Data Exchange (ETDEWEB)

    Zoboli, A., E-mail: zoboli@disi.unitn.i [Dipartimento di Ingegneria e Scienza dell' Informazione, Universita di Trento, and INFN, Sezione di Padova (Gruppo Collegato di Trento), Via Sommarive, 14, I-38100 Povo di Trento (Italy); Boscardin, M. [Fondazione Bruno Kessler, Centro per i Materiali e i Microsistemi, Via Sommarive, 18, I-38100 Povo di Trento (Italy); Bosisio, L. [Dipartimento di Fisica, Universita di Trieste, and INFN, Sezione di Trieste, Via A. Valerio, 2, I-34127 Trieste (Italy); Dalla Betta, G.-F. [Dipartimento di Ingegneria e Scienza dell' Informazione, Universita di Trento, and INFN, Sezione di Padova (Gruppo Collegato di Trento), Via Sommarive, 14, I-38100 Povo di Trento (Italy); Piemonte, C.; Ronchin, S.; Zorzi, N. [Fondazione Bruno Kessler, Centro per i Materiali e i Microsistemi, Via Sommarive, 18, I-38100 Povo di Trento (Italy)

    2010-01-11

    Owing to their superior radiation hardness compared to planar detectors, 3D detectors are one of the most promising technologies for the LHC upgrade foreseen in 2017. Fondazione Bruno Kessler has developed 3D Double-side Double-Type Column (3D-DDTC) detectors providing a technological simplifications with respect to a standard 3D process while aiming at comparable detector performance. We present selected results from the electrical characterization of 3D-DDTC structures from the second batch made on p-type substrates, supported also by TCAD simulations.

  17. Structure and mechanism of Zn2+-transporting P-type ATPases

    DEFF Research Database (Denmark)

    Wang, Kaituo; Sitsel, Oleg; Meloni, Gabriele

    2014-01-01

    Zinc is an essential micronutrient for all living organisms. It is required for signalling and proper functioning of a range of proteins involved in, for example, DNA binding and enzymatic catalysis1. In prokaryotes and photosynthetic eukaryotes, Zn2+-transporting P-type ATPases of class IB (Znt....... The structures reveal a similar fold to Cu+-ATPases, with an amphipathic helix at the membrane interface. A conserved electronegative funnel connects this region to the intramembranous high-affinity ion-binding site and may promote specific uptake of cellular Zn2+ ions by the transporter. The E2P structure...

  18. Elastic constants determined by nanoindentation for p-type thermoelectric half-Heusler

    Energy Technology Data Exchange (ETDEWEB)

    Gahlawat, S.; Wheeler, L.; White, K. W., E-mail: zren@uh.edu, E-mail: kwwhite@uh.edu [Department of Mechanical Engineering, University of Houston, Houston, Texas 77204 (United States); He, R.; Chen, S.; Ren, Z. F., E-mail: zren@uh.edu, E-mail: kwwhite@uh.edu [Department of Physics and TcSUH, University of Houston, Houston, Texas 77204 (United States)

    2014-08-28

    This paper presents a study of the elastic properties of the p-type thermoelectric half-Heusler material, Hf{sub 0.44}Zr{sub 0.44}Ti{sub 0.12}CoSb{sub 0.8}Sn{sub 0.2}, using nanoindentation. Large grain-sized polycrystalline specimens were fabricated for these measurements, providing sufficient indentation targets within single grains. Electron Backscatter Diffraction methods indexed the target grains for the correlation needed for our elastic analysis of individual single crystals for this cubic thermoelectric material. Elastic properties, including the Zener ratio and the Poisson ratio, obtained from the elasticity tensor are also reported.

  19. Ferromagnetic-resonance induced electromotive forces in Ni81Fe19 | p-type diamond

    Science.gov (United States)

    Fukui, Naoki; Morishita, Hiroki; Kobayashi, Satoshi; Miwa, Shinji; Mizuochi, Norikazu; Suzuki, Yoshishige

    2016-10-01

    We report on direct-current (DC) electromotive forces (emfs) in a nickel-iron alloy (Ni81 Fe19) | p-type diamond under the ferromagnetic resonance of the Ni81Fe19 layer at room temperature. The observed DC emfs take its maximum around the ferromagnetic resonant frequency of the Ni81Fe19, and their signs are reversed by reversing the direction of an externally-applied magnetic field; it shows that the observed DC emfs are spin-related emfs.

  20. Single-structure heater and temperature sensor using a p-type polycrystalline diamond resistor

    Energy Technology Data Exchange (ETDEWEB)

    Yang, G.S.; Aslam, D.M. [Michigan State Univ., East Lansing, MI (United States). Dept. of Electrical Engineering

    1996-05-01

    Heat generation and temperature sensing are required for heating applications and for liquid level sensors, mass flow meters, and vacuum and pressure gauges which are based on variations of heat dissipation. Heat generation and temperature sensing are reported in a single p-type diamond resistor fabricated on an oxidized Si substrate using diamond film technology compatible with integrated circuit (IC) processing. Power densities in excess of 600 W/in.{sup 2} are observed for the heaters. The temperature response of the sensor is characterized in the temperature range of 300--725 K. Such a diamond heater/sensor device is reported for the first time.

  1. Methods for enhancing P-type doping in III-V semiconductor films

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Feng; Stringfellow, Gerald; Zhu, Junyi

    2017-08-01

    Methods of doping a semiconductor film are provided. The methods comprise epitaxially growing the III-V semiconductor film in the presence of a dopant, a surfactant capable of acting as an electron reservoir, and hydrogen, under conditions that promote the formation of a III-V semiconductor film doped with the p-type dopant. In some embodiments of the methods, the epitaxial growth of the doped III-V semiconductor film is initiated at a first hydrogen partial pressure which is increased to a second hydrogen partial pressure during the epitaxial growth process.

  2. P-Type Doping of GaN by Mg+ Implantation

    Institute of Scientific and Technical Information of China (English)

    YAO Shu-De; ZHAO Qiang; ZHOU Sheng-Qiang; YANG Zi-Jian; LU Yi-Hong; SUN Chang-Chun; SUN Chang; ZHANG Guo-Yi; VANTOMME Andre; PIPELEERS Bert

    2003-01-01

    Mg+ and Mg++P+ were introduced into GaN by ion implantation. The structure and crystalline quality of the GaN samples were analysed by Rutherford backscattering and channelling spectrometry before (xmin = 1.6%) and after implantation (Xmin = 4.1%). X-ray diffraction reveals the existence of implantation-induced damage in the case of post-implantation followed by rapid thermal annealing. The resistivity, average factor, carrier concentration and carrier mobility were measured by the Hall effect. The transformation from n-type to p-type for GaN was observed.

  3. Transient expression of P-type ATPases in tobacco epidermal cells

    DEFF Research Database (Denmark)

    Pedas, Lisbeth Rosager; Palmgren, Michael Broberg; Lopez Marques, Rosa Laura

    2016-01-01

    Transient expression in tobacco cells is a convenient method for several purposes such as analysis of protein-protein interactions and the subcellular localization of plant proteins. A suspension of Agrobacterium tumefaciens cells carrying the plasmid of interest is injected into the intracellular...... for example protein-protein interaction studies. In this chapter, we describe the procedure to transiently express P-type ATPases in tobacco epidermal cells, with focus on subcellular localization of the protein complexes formed by P4-ATPases and their β-subunits....

  4. Above bandgap luminescence of p-type GaAs epitaxial layers

    Science.gov (United States)

    Sapriel, J.; Chavignon, J.; Alexandre, F.; Azoulay, R.; Sermage, B.; Rao, K.; Voos, M.

    1991-08-01

    New photoluminescence bands are observed in p-type GaAs epitaxial layers at 300 and 80 K, above the bandgap. These bands are independent of the nature of the dopant (Zn, Be, C) and of the growth technique (MBE or MOCVD). Their intensities increase as a function of the p doping (1 × 10 17 < p < 2 × 10 20cm-3) and peak at energies which correspond to transitions between the Γ 6, L 6 and X 6 minima of the conduction band and the Γ 8 and Γ 7 maxima of the valence band.

  5. Optical properties of ZnO nanowire arrays electrodeposited on n- and p-type Si(1 1 1): Effects of thermal annealing

    Energy Technology Data Exchange (ETDEWEB)

    Lupan, O., E-mail: oleg-lupan@chimie-paristech.fr [Laboratoire d' Electrochimie, Chimie des Interfaces et Modelisation pour l' Energie (LECIME), UMR 7575 CNRS, Chimie ParisTech, 11 rue P. et M. Curie, 75231 Paris (France); Pauporte, Th., E-mail: thierry-pauporte@chimie-paristech.fr [Laboratoire d' Electrochimie, Chimie des Interfaces et Modelisation pour l' Energie (LECIME), UMR 7575 CNRS, Chimie ParisTech, 11 rue P. et M. Curie, 75231 Paris (France); Tiginyanu, I.M.; Ursaki, V.V. [Institute of Electronic Engineering and Nanotechnologies, Institute of Applied Physics, Academy of Sciences of Moldova, Chisinau MD-2028 (Moldova, Republic of); Heinrich, H.; Chow, L. [Department of Physics, University of Central Florida, PO Box 162385 Orlando, FL 32816-2385 (United States)

    2011-09-25

    Highlights: > A new template-free electrochemical deposition method for the synthesis of ZnO nanorods/nanowires directly on n- and p-type silicon (Si) substrates. > Improved structural, electrical and optical properties of the ZnO nanowires/p-Si (1 1 1) heterojunction have been demonstrated. > Photodetectors have been fabricated based on the n-ZnO nanowires/p-Si heterojunction obtained by electrodeposition. - Abstract: Electrodeposition is a low temperature and low cost growth method of high quality nanostructured active materials for optoelectronic devices. We report the electrochemical preparation of ZnO nanorod/nanowire arrays on n-Si(1 1 1) and p-Si(1 1 1). The effects of thermal annealing and type of substrates on the optical properties of ZnO nanowires electroplated on silicon (1 1 1) substrate are reported. We fabricated ZnO nanowires/p-Si structure that exhibits a strong UV photoluminescence emission and a negligible visible emission. This UV photoluminescence emission proves to be strongly influenced by the thermal annealing at 150-800 deg. C. Photo-detectors have been fabricated based on the ZnO nanowires/p-Si heterojunction.

  6. Porous silicon localization for implementation in matrix biosensors

    Energy Technology Data Exchange (ETDEWEB)

    Benilov, A. [Laboratoire d' Electronique, Optoelectronique et Microsystemes, Ecole Centrale de Lyon, BP 163-69131 Ecully Cedex (France) and Kyiv Taras Shevchenko National University, 64 Volodymyrska, 01033 Kiev (Ukraine)]. E-mail: arthur@univ.kiev.ua; Cabrera, M. [Laboratoire d' Electronique, Optoelectronique et Microsystemes, Ecole Centrale de Lyon, BP 163-69131 Ecully Cedex (France); Skryshevsky, V. [Kyiv Taras Shevchenko National University, 64 Volodymyrska, 01033 Kiev (Ukraine); Martin, J.-R. [Laboratoire d' Electronique, Optoelectronique et Microsystemes, Ecole Centrale de Lyon, BP 163-69131 Ecully Cedex (France)

    2007-05-15

    The search of appropriate substrates and methods of surface DNA functionalisation is one of the important tasks of semiconductor biosensors. In this work we develop a method of light-assisted porous silicon etching in order to localize porous silicon spots on silicon substrate for matrix fluorophore-labeled DNA sensors implementation. The principal difference of porous spots localization proposed is considered for n- and p-type Si substrates under the condition of supplementary illumination. The tuning of the porous profile via applying of lateral electric field is proposed and experimentally proved.

  7. Review. Industrial silicon wafer solar cells. Status and trends

    Energy Technology Data Exchange (ETDEWEB)

    Aberle, Armin G.; Boreland, Matthew B.; Hoex, Bram; Mueller, Thomas [National Univ. of Singapore (Singapore). Solar Energy Research Institute of Singapore (SERIS)

    2012-11-01

    Crystalline silicon solar cells dominate today's global photovoltaic (PV) market. This paper presents the status and trends of the most important industrial silicon wafer solar cells, ranging from standard p-type homojunction cells to heterojunction cells on n-type wafers. Owing to ongoing technological innovations such as improved surface passivation and the use of increasingly thinner wafers, the trend towards higher cell efficiencies and lower dollar/watt costs is expected to continue during the next 10 years, making silicon wafer based PV modules a moving target for any competing PV technology. (orig.)

  8. A P-type ATPase importer that discriminates between essential and toxic transition metals.

    Science.gov (United States)

    Lewinson, Oded; Lee, Allen T; Rees, Douglas C

    2009-03-24

    Transition metals, although being essential cofactors in many physiological processes, are toxic at elevated concentrations. Among the membrane-embedded transport proteins that maintain appropriate intracellular levels of transition metals are ATP-driven pumps belonging to the P-type ATPase superfamily. These metal transporters may be differentiated according to their substrate specificities, where the majority of pumps can extrude either silver and copper or zinc, cadmium, and lead. In the present report, we have established the substrate specificities of nine previously uncharacterized prokaryotic transition-metal P-type ATPases. We find that all of the newly identified exporters indeed fall into one of the two above-mentioned categories. In addition to these exporters, one importer, Pseudomonas aeruginosa Q9I147, was also identified. This protein, designated HmtA (heavy metal transporter A), exhibited a different substrate recognition profile from the exporters. In vivo metal susceptibility assays, intracellular metal measurements, and transport experiments all suggest that HmtA mediates the uptake of copper and zinc but not of silver, mercury, or cadmium. The substrate selectivity of this importer ensures the high-affinity uptake of essential metals, while avoiding intracellular contamination by their toxic counterparts.

  9. Thermal oxidation of Ni films for p-type thin-film transistors

    KAUST Repository

    Jiang, Jie

    2013-01-01

    p-Type nanocrystal NiO-based thin-film transistors (TFTs) are fabricated by simply oxidizing thin Ni films at temperatures as low as 400 °C. The highest field-effect mobility in a linear region and the current on-off ratio are found to be 5.2 cm2 V-1 s-1 and 2.2 × 103, respectively. X-ray diffraction, transmission electron microscopy and electrical performances of the TFTs with "top contact" and "bottom contact" channels suggest that the upper parts of the Ni films are clearly oxidized. In contrast, the lower parts in contact with the gate dielectric are partially oxidized to form a quasi-discontinuous Ni layer, which does not fully shield the gate electric field, but still conduct the source and drain current. This simple method for producing p-type TFTs may be promising for the next-generation oxide-based electronic applications. © 2013 the Owner Societies.

  10. Analysis of carrier concentration, lifetime, and electron mobility on p-type HgCdTe

    Science.gov (United States)

    Yoo, Sang Dong; Kwack, Kae Dal

    1998-03-01

    Minority carrier transport characteristics of vacancy-doped p-type HgCdTe such as carrier concentration, lifetime, and mobility are investigated. In the calculation of the carrier concentration two acceptor levels—a donor level and a trap level—were taken into account. The acceptor levels have been described by two models—two independent singly ionized levels and a divalent level with two ionization energies. When each model was examined by calculating electron mobility as a function of temperature, the latter was found to be more accurate. Electron mobility as a function of majority carrier concentration was also presented for both n-type and p-type HgCdTe with 0.225 Cd mole fraction. Steady state electron lifetime was computed assuming the acceptor levels and the trap level would act as Schokley-Read-Hall type recombination centers. The calculated results using the divalent acceptor model were in good agreement with the experimental data.

  11. Synthesis and characterization of p-type boron-doped IIb diamond large single crystals

    Institute of Scientific and Technical Information of China (English)

    Li Shang-Sheng; Ma Hong-An; Li Xiao-Lei; Su Tai-Chao; Huang Guo-Feng; Li Yong; Jia Xiao-Peng

    2011-01-01

    High-quality p-type boron-doped II0b diamond large single crystals are successfully synthesized by the temperature gradient method in a china-type cubic anvil high-pressure apparatus at about 5.5 GPa and 1600 K. The morphologies and surface textures of the synthetic diamond crystals with different boron additive quantities are characterized by using an optical microscope and a scanning electron microscope respectively. The impurities of nitrogen and boron in diamonds are detected by micro Fourier transform infrared technique. The electrical properties including resistivities, Hall coefficients, Hall mobilities and carrier densities of the synthesized samples are measured by a four-point probe and the Hall effect method. The results show that large p-type boron-doped diamond single crystals with few nitrogen impurities have been synthesized. With the increase of quantity of additive boron, some high-index crystal faces such as {113} gradually disappear, and some stripes and triangle pits occur on the crystal surface. This work is helpful for the further research and application of boron-doped semiconductor diamond.

  12. EEG/MEG forward simulation through h- and p-type finite elements

    Energy Technology Data Exchange (ETDEWEB)

    Pursiainen, S [Institute of Mathematics, Box 1100, FI-02015 Helsinki University of Technology (Finland)], E-mail: sampsa.pursiainen@tkk.fi

    2008-07-15

    Electro/Magnetoencephalography (EEG/MEG) is a non-invasive imaging modality, in which a primary current density generated by the neural activity in the brain is to be reconstructed from external electric potential/magnetic field measurements. This work focuses on effective and accurate simulation of the EEG/MEG forward model through the h- and p-versions of the finite element method (h- and p-FEM). The goal is to compare the effectiveness of these two versions in forward simulation. Both h- and p-type forward simulations are described and implemented, and the technical solutions found are discussed. These include, for example, suitable ways to generate a finite element mesh for a real head geometry through the use of different element types. Performances of the two implemented forward simulation types are compared by measuring directly the forward modeling error, as well as by computing reconstructions through a regularized FOCUSS (FOCal Underdetermined System Solver) algorithm. The results obtained suggest that the p-type performs better in terms of the forward modeling error. However, both types perform well in regularized FOCUSS reconstruction.

  13. Wide band gap p-type windows by CBD and SILAR methods

    Energy Technology Data Exchange (ETDEWEB)

    Sankapal, B.R.; Goncalves, E.; Ennaoui, A.; Lux-Steiner, M.Ch

    2004-03-22

    Chemical deposition methods, namely, chemical bath deposition (CBD) and successive ionic layer adsorption and reaction (SILAR) have been used to deposit wide band gap p-type CuI and CuSCN thin films at room temperature (25 deg. C) in aqueous medium. Growth of these films requires the use of Cu (I) cations as a copper ions source. This is achieved by complexing Cu (II) ions using Na{sub 2}S{sub 2}O{sub 3}. The anion sources are either KI as iodine or KSCN as thiocyanide ions for CuI and CuSCN films, respectively. The preparative parameters are optimized with the aim to use these p-type materials as windows for solar cells. Different substrates are used, namely: glass, fluorine doped tin oxide coated glass and CuInS{sub 2} (CIS). X-ray diffraction, scanning electron microscopy, atomic force microscopy and optical absorption spectroscopy are used for structural, surface morphological and optical studies, and the results are discussed.

  14. Carrier induced local moment magnetization in p-type Sn1-xMnxTe

    Science.gov (United States)

    Behera, Sashi S.; Tripathi, Pratibha; Nayak, Sanjeev K.; Tripathi, Gouri S.

    2017-08-01

    We derive a theory of carrier induced local moment magnetization of p-type Sn1-xMnxTe based on the Hubbard model, k → · π → electronic structure method (k → is the electronic wave vector and π → is the relativistic momentum operator) and the statistical paramagnetic approach for the localized moments. The Hubbard model is used to derive an internal exchange magnetic field. The difference in exchange self-energy is expressed in terms of an internal exchange field that is proportional to the parameter U, the onsite Coulomb repulsion, and the spin-density of carriers. In the present theory, the k → · π → + U model is integrated with the statistical paramagnetic theory for localized spins, which is then solved in a self-consistent manner by adding the exchange field to the applied field. The technique is applied to study the magnetic properties of p-type Sn1-xMnxTe, an important material for spintronics devices. The local moment magnetization calculated using the total magnetic field self-consistently agrees with the experimental observations. Magnetization and the exchange field studied as functions of the applied field, temperature and carrier concentration yield results on expected lines. Ours is a mechanism that is different from the RKKY interaction, normally invoked for carrier induced ferromagnetism and is thus a novelty.

  15. Anabaena sp. DyP-type peroxidase is a tetramer consisting of two asymmetric dimers.

    Science.gov (United States)

    Yoshida, Toru; Ogola, Henry Joseph Oduor; Amano, Yoshimi; Hisabori, Toru; Ashida, Hiroyuki; Sawa, Yoshihiro; Tsuge, Hideaki; Sugano, Yasushi

    2016-01-01

    DyP-type peroxidases are a newly discovered family of heme peroxidases distributed from prokaryotes to eukaryotes. Recently, using a structure-based sequence alignment, we proposed the new classes, P, I and V, as substitutes for classes A, B, C, and D [Arch Biochem Biophys 2015;574:49-55]. Although many class V enzymes from eukaryotes have been characterized, only two from prokaryotes have been reported. Here, we show the crystal structure of one of these two enzymes, Anabaena sp. DyP-type peroxidase (AnaPX). AnaPX is tetramer formed from Cys224-Cys224 disulfide-linked dimers. The tetramer of wild-type AnaPX was stable at all salt concentrations tested. In contrast, the C224A mutant showed salt concentration-dependent oligomeric states: in 600 mM NaCl, it maintained a tetrameric structure, whereas in the absence of salt, it dissociated into monomers, leading to a reduction in thermostability. Although the tetramer exhibits non-crystallographic, 2-fold symmetry in the asymmetric unit, two subunits forming the Cys224-Cys224 disulfide-linked dimer are related by 165° rotation. This asymmetry creates an opening to cavities facing the inside of the tetramer, providing a pathway for hydrogen peroxide access. Finally, a phylogenetic analysis using structure-based sequence alignments showed that class V enzymes from prokaryotes, including AnaPX, are phylogenetically closely related to class V enzymes from eukaryotes.

  16. Valence band states in Si-based p-type delta-doped field effect transistors

    Energy Technology Data Exchange (ETDEWEB)

    Martinez-Orozco, J C; Vlaev, Stoyan J, E-mail: jcmover@correo.unam.m [Unidad Academica de Fisica, Universidad Autonoma de Zacatecas, Calzada Solidaridad esquina con Paseo la Bufa S/N, C.P. 98060, Zacatecas, Zac. (Mexico)

    2009-05-01

    We present tight-binding calculations of the hole level structure of delta-doped Field Effect Transistor in a Si matrix within the first neighbors sp{sup 3}s* semi-empirical tight-binding model including spin. We employ analytical expressions for Schottky barrier potential and the p-type delta-doped well based on a Thomas-Fermi approximation, we consider these potentials as external ones, so in the computations they are added to the diagonal terms of the tight-binding Hamiltonian, by this way we have the possibility to study the energy levels behavior as we vary the backbone parameters in the system: the two-dimensional impurity density (p{sub 2d}) of the p-type delta-doped well and the contact voltage (V{sub c}). The aim of this calculation is to demonstrate that the tight-binding approximation is suitable for device characterization that permits us to propose optimal values for the input parameters involved in the device design.

  17. Atomic layer deposition of undoped TiO2 exhibiting p-type conductivity.

    Science.gov (United States)

    Iancu, Andrei T; Logar, Manca; Park, Joonsuk; Prinz, Fritz B

    2015-03-11

    With prominent photocatalytic applications and widespread use in semiconductor devices, TiO2 is one of the most popular metal oxides. However, despite its popularity, it has yet to achieve its full potential due to a lack of effective methods for achieving p-type conductivity. Here, we show that undoped p-type TiO2 films can be fabricated by atomic layer deposition (ALD) and that their electrical properties can be controlled across a wide range using proper postprocessing anneals in various ambient environments. Hole mobilities larger than 400 cm(2)/(V·s) are accessible superseding the use of extrinsic doping, which generally produces orders of magnitude smaller values. Through a combination of analyses and experiments, we provide evidence that this behavior is primarily due to an excess of oxygen in the films. This discovery enables entirely new categories of TiO2 devices and applications, and unlocks the potential to improve existing ones. TiO2 homojunction diodes fabricated completely by ALD are developed as a demonstration of the utility of these techniques and shown to exhibit useful rectifying characteristics even with minimal processing refinement.

  18. Piezo-phototronic effect on electroluminescence properties of p-type GaN thin films.

    Science.gov (United States)

    Hu, Youfan; Zhang, Yan; Lin, Long; Ding, Yong; Zhu, Guang; Wang, Zhong Lin

    2012-07-11

    We present that the electroluminescence (EL) properties of Mg-doped p-type GaN thin films can be tuned by the piezo-phototronic effect via adjusting the minority carrier injection efficiency at the metal-semiconductor (M-S) interface by strain induced polarization charges. The device is a metal-semiconductor-metal structure of indium tin oxide (ITO)-GaN-ITO. Under different straining conditions, the changing trend of the transport properties of GaN films can be divided into two types, corresponding to the different c-axis orientations of the films. An extreme value was observed for the integral EL intensity under certain applied strain due to the adjusted minority carrier injection efficiency by piezoelectric charges introduced at the M-S interface. The external quantum efficiency of the blue EL at 430 nm was changed by 5.84% under different straining conditions, which is 1 order of magnitude larger than the change of the green peak at 540 nm. The results indicate that the piezo-phototronic effect has a larger impact on the shallow acceptor states related EL process than on the one related to the deep acceptor states in p-type GaN films. This study has great significance on the practical applications of GaN in optoelectronic devices under a working environment where mechanical deformation is unavoidable such as for flexible/printable light emitting diodes.

  19. Efficiency Enhancement of Nanoporous Silicon/Polycrystalline-Silicon Solar Cells by Application of Trenched Electrodes

    OpenAIRE

    Kuen-Hsien Wu; Chia-Chun Tang

    2014-01-01

    Trenched electrodes were proposed to enhance the short-circuit current and conversion efficiency of polycrystalline-silicon (poly-Si) solar cells with nanoporous silicon (NPS) surface layers. NPS films that served as textured surface layers were firstly prepared on heavily doped p+-type (100) poly-Si wafers by anodic etching process. Interdigitated trenches were formed in the NPS layers by a reactive-ion-etch (RIE) process and Cr/Al double-layered metal was then deposited to fill the trenches...

  20. Effect of temperature and silicon resistivity on the elaboration of silicon nanowires by electroless etching

    Energy Technology Data Exchange (ETDEWEB)

    Fellahi, Ouarda, E-mail: fellahi_warda@yahoo.fr [Silicon Technology Development Unit, 02 Bd Frantz Fanon, BP 140 Alger-7 Merveilles, Algiers (Algeria); Hadjersi, Toufik [Silicon Technology Development Unit, 02 Bd Frantz Fanon, BP 140 Alger-7 Merveilles, Algiers (Algeria); Maamache, Mustapha [Laboratoire de Physique Quantique et Systemes Dynamiques, Universite Ferhat Abbas de Setif (Algeria); Bouanik, Sihem; Manseri, Amar [Silicon Technology Development Unit, 02 Bd Frantz Fanon, BP 140 Alger-7 Merveilles, Algiers (Algeria)

    2010-11-01

    The morphology of silicon nanowire (SiNW) layers formed by Ag-assisted electroless etching in HF/H{sub 2}O{sub 2} solution was studied. Prior to the etching, the Ag nanoparticles were deposited on p-type Si(1 0 0) wafers by electroless metal deposition (EMD) in HF/AgNO{sub 3} solution at room temperature. The effect of etching temperature and silicon resistivity on the formation process of nanowires was studied. The secondary ion mass spectra (SIMS) technique is used to study the penetration of silver in the etched layers. The morphology of etched layers was investigated by scanning electron microscope (SEM).

  1. Silicon Spintronics

    NARCIS (Netherlands)

    Jansen, R.

    2008-01-01

    Integration of magnetism and mainstream semiconductor electronics could impact information technology in ways beyond imagination. A pivotal step is implementation of spin-based electronic functionality in silicon devices. Remarkable progress made during the last two years gives confidence that this

  2. New photovoltaic devices based on the sensitization of p-type semiconductors: challenges and opportunities.

    Science.gov (United States)

    Odobel, Fabrice; Le Pleux, Loïc; Pellegrin, Yann; Blart, Errol

    2010-08-17

    Because solar energy is the most abundant renewable energy resource, the clear connection between human activity and global warming has strengthened the interest in photovoltaic science. Dye-sensitized solar cells (DSSCs) provide a promising low-cost technology for harnessing this energy source. Until recently, much of the research surrounding DSSCs had been focused on the sensitization of n-type semiconductors, such as titanium dioxide (Gratzel cells). In an n-type dye-sensitized solar cell (n-DSSC), an electron is injected into the conduction band of an n-type semiconductor (n-SC) from the excited state of the sensitizer. Comparatively few studies have examined the sensitization of wide bandgap p-type semiconductors. In a p-type DSSC (p-DSSC), the photoexcited sensitizer is reductively quenched by hole injection into the valence band of a p-type semiconductor (p-SC). The study of p-DSSCs is important both to understand the factors that control the rate of hole photoinjection and to aid the rational design of efficient p-DSSCs. In theory, p-DSSCs should be able to work as efficiently as n-DSSCs. In addition, this research provides a method for preparing tandem DSSCs consisting of a TiO(2)-photosensitized anode and a photosensitized p-type SC as a cathode. Tandem DSSCs are particularly important because they represent low-cost photovoltaic devices whose photoconversion efficiencies could exceed 15%. This Account describes recent research results on p-DSSCs. Because these photoelectrochemical devices are the mirror images of conventional n-DSSCs, they share some structural similarities, but they use different materials and have different charge transfer kinetics. In this technology, nickel oxide is the predominant p-SC material used, but much higher photoconversion efficiencies could be achieved with new p-SCs materials with deeper valence band potential. Currently, iodide/triiodide is the main redox mediator of electron transport within these devices, but we expect

  3. p-Type semiconducting nickel oxide as an efficiency-enhancing anodal interfacial layer in bulk heterojunction solar cells

    Science.gov (United States)

    Irwin, Michael D; Buchholz, Donald B; Marks, Tobin J; Chang, Robert P. H.

    2014-11-25

    The present invention, in one aspect, relates to a solar cell. In one embodiment, the solar cell includes an anode, a p-type semiconductor layer formed on the anode, and an active organic layer formed on the p-type semiconductor layer, where the active organic layer has an electron-donating organic material and an electron-accepting organic material.

  4. Gate tunable graphene-silicon Ohmic/Schottky contacts

    Science.gov (United States)

    Chen, Chun-Chung; Chang, Chia-Chi; Li, Zhen; Levi, A. F. J.; Cronin, Stephen B.

    2012-11-01

    We show that the I-V characteristics of graphene-silicon junctions can be actively tuned from rectifying to Ohmic behavior by electrostatically doping the graphene with a polymer electrolyte gate. Under zero applied gate voltage, we observe rectifying I-V characteristics, demonstrating the formation of a Schottky junction at the graphene-silicon interface. Through appropriate gating, the Fermi energy of the graphene can be varied to match the conduction or valence band of silicon, thus forming Ohmic contacts with both n- and p-type silicon. Over the applied gate voltage range, the low bias conductance can be varied by more than three orders of magnitude. By varying the top gate voltage from -4 to +4 V, the Fermi energy of the graphene is shifted between -3.78 and -5.47 eV; a shift of ±0.85 eV from the charge neutrality point. Since the conduction and valence bands of the underlying silicon substrate lie within this range, at -4.01 and -5.13 eV, the Schottky barrier height and depletion width can be decreased to zero for both n- and p-type silicon under the appropriate top gating conditions. I-V characteristics taken under illumination show that the photo-induced current can be increased or decreased based on the graphene-silicon work function difference.

  5. Lithographically patterned silicon nanostructures on silicon substrates

    Energy Technology Data Exchange (ETDEWEB)

    Megouda, Nacera [Institut de Recherche Interdisciplinaire (IRI, USR 3078), Universite Lille1, Parc de la Haute Borne, 50 Avenue de Halley-BP 70478, 59658 Villeneuve d' Ascq and Institut d' Electronique, de Microelectronique et de Nanotechnologie (IEMN, CNRS-8520), Cite Scientifique, Avenue Poincare-B.P. 60069, 59652 Villeneuve d' Ascq (France); Faculte des Sciences, Universite Mouloud Mammeri, Tizi-Ouzou (Algeria); Unite de Developpement de la Technologie du Silicium (UDTS), 2 Bd. Frantz Fanon, B.P. 140 Alger-7 merveilles, Alger (Algeria); Piret, Gaeelle; Galopin, Elisabeth; Coffinier, Yannick [Institut de Recherche Interdisciplinaire (IRI, USR 3078), Universite Lille1, Parc de la Haute Borne, 50 Avenue de Halley-BP 70478, 59658 Villeneuve d' Ascq and Institut d' Electronique, de Microelectronique et de Nanotechnologie (IEMN, CNRS-8520), Cite Scientifique, Avenue Poincare-B.P. 60069, 59652 Villeneuve d' Ascq (France); Hadjersi, Toufik, E-mail: hadjersi@yahoo.com [Unite de Developpement de la Technologie du Silicium (UDTS), 2 Bd. Frantz Fanon, B.P. 140 Alger-7 merveilles, Alger (Algeria); Elkechai, Omar [Faculte des Sciences, Universite Mouloud Mammeri, Tizi-Ouzou (Algeria); and others

    2012-06-01

    The paper reports on controlled formation of silicon nanostructures patterns by the combination of optical lithography and metal-assisted chemical dissolution of crystalline silicon. First, a 20 nm-thick gold film was deposited onto hydrogen-terminated silicon substrate by thermal evaporation. Gold patterns (50 {mu}m Multiplication-Sign 50 {mu}m spaced by 20 {mu}m) were transferred onto the silicon wafer by means of photolithography. The etching process of crystalline silicon in HF/AgNO{sub 3} aqueous solution was studied as a function of the silicon resistivity, etching time and temperature. Controlled formation of silicon nanowire arrays in the unprotected areas was demonstrated for highly resistive silicon substrate, while silicon etching was observed on both gold protected and unprotected areas for moderately doped silicon. The resulting layers were characterized using scanning electron microscopy (SEM).

  6. NbFeSb based p-type half-Heusler for power generation applications

    Science.gov (United States)

    Joshi, Giri; He, Ran; Engber, Michael; Samsonidze, Georgy; Pantha, Tej; Dahal, Ekraj; Dahal, Keshab; Yang, Jian; Lan, Yucheng; Kozinsky, Boris; Ren, Zhifeng

    2015-03-01

    We report a peak dimensionless figure-of-merit (ZT) of ~1 at 700 oC in nanostructured p-type Nb0.6Ti0.4FeSb0.95Sn0.05composition. Even though the power factor of the Nb0.6Ti0.4FeSb0.95Sn0.05 composition is improved by 25% in comparison to the previously reported p-type Hf0.44Zr0.44Ti0.12CoSb0.8Sn0.2, the ZT value is not increased due to a higher thermal conductivity. However, the higher power factor of the Nb0.6Ti0.4FeSb0.95Sn0.05 composition led to a 15% increase in power output of a thermoelectric device in comparison to a device made from the previous best material Hf0.44Zr0.44Ti0.12CoSb0.8Sn0.2. The n-type material used to make the unicouple device is the best reported nanostructured Hf0.25Zr0.75NiSn0.99Sb0.01 composition with the lowest hafnium (Hf) content. Both the p- and n-type nanostructured samples are prepared by ball milling the arc melted ingot and hot pressing the finely ground powders. Moreover, the raw material cost of the Nb0.6Ti0.4FeSb0.95Sn0.05 composition is more than six times lower compared to the cost of the previous best p-type Hf0.44Zr0.44Ti0.12CoSb0.8Sn0.2. This cost reduction is crucial for these materials to be used in large-scale quantities for vehicle and industrial waste heat recovery applications. DOE:DE-EE0004840.

  7. Electronic characteristics of p-type transparent SnO monolayer with high carrier mobility

    Science.gov (United States)

    Du, Juan; Xia, Congxin; Liu, Yaming; Li, Xueping; Peng, Yuting; Wei, Shuyi

    2017-04-01

    More recently, two-dimensional (2D) SnO nanosheets are attaching great attention due to its excellent carrier mobility and transparent characteristics. Here, the stability, electronic structures and carrier mobility of SnO monolayer are investigated by using first-principles calculations. The calculations of the phonon dispersion spectra indicate that SnO monolayer is dynamically stable. Moreover, the band gap values are decreased from 3.93 eV to 2.75 eV when the tensile strain is applied from 0% to 12%. Interestingly, SnO monolayer is a p-type transparent semiconducting oxide with hole mobility of 641 cm2 V-1 s-1, which is much higher than that of MoS2 monolayer. These findings make SnO monolayer becomes a promising 2D material for applications in nanoelectronic devices.

  8. Chemical synthesis of p-type nanocrystalline copper selenide thin films for heterojunction solar cells

    Science.gov (United States)

    Ambade, Swapnil B.; Mane, R. S.; Kale, S. S.; Sonawane, S. H.; Shaikh, Arif V.; Han, Sung-Hwan

    2006-12-01

    Nanocrystalline thin films of copper selenide have been grown on glass and tin doped-indium oxide substrates using chemical method. At ambient temperature, golden films have been synthesized and annealed at 200 °C for 1 h and were examined for their structural, surface morphological and optical properties by means of X-ray diffraction (XRD), scanning electron microscopy and UV-vis spectrophotometry techniques, respectively. Cu 2- xSe phase was confirmed by XRD pattern and spherical grains of 30 ± 4 - 40 ± 4 nm in size aggregated over about 130 ± 10 nm islands were seen by SEM images. Effect of annealing on crystallinity improvement, band edge shift and photoelectrochemical performance (under 80 mW/cm 2 light intensity and in lithium iodide electrolyte) has been studied and reported. Observed p-type electrical conductivity in copper selenide thin films make it a suitable candidate for heterojunction solar cells.

  9. How thermoelectric properties of p-type Tl-filled skutterudites are improved

    Directory of Open Access Journals (Sweden)

    Donghun Kim

    2013-09-01

    Full Text Available The high-temperature thermoelectric properties of p-type Tl-filled skutterudites TlxFe1Co3Sb12 (x = 0, 0.2, 0.4, 0.6, and 0.8 were examined. While samples with x ≤ 0.4 were single-phase Tl-filled skutterudite, samples with x = 0.6 and 0.8 were composed of two phases: TlxFe1Co3Sb12 (x ≈ 0.4 as the matrix phase and a Tl-Fe-Sb ternary alloy. The thermal conductivity (κ was reduced effectively by Tl addition, but the secondary phase increased κ slightly. The maximum value of the dimensionless figure of merit ZT (=S2T/ρ/κ, where T is the absolute temperature was 0.36 at 723 K for Tl0.2Fe1Co3Sb12.

  10. P-type calcium channels are blocked by the alkaloid daurisoline.

    Science.gov (United States)

    Lu, Y M; Fröstl, W; Dreessen, J; Knöpfel, T

    1994-07-21

    IN looking for a structurally defined non-peptide P-channel blocker we have tested the alkaloid daurisoline which has been isolated from traditional Chinese medicinal herb (Menispermum dauricum) used for the treatment of epilepsy, hypertension and asthma. We have found that daurisoline is an inhibitor of omega-Aga-IVA sensitive barium currents in cerebellar Purkinje cells and of excitatory postsynaptic potentials evoked in Purkinje cells by stimulating parallel fibres in acutely prepared cerebellar slices. Daurisoline did not significantly affect omega-Aga-IVA-insensitive barium currents recorded from granule cells freshly isolated from rat cerebellum. Daurisoline passes the blood-brain barrier and will, therefore, facilitate the functional characterization of brain calcium channels as well as the exploration of P-type calcium channels as possible drug targets.

  11. Nanoscale Cross-Point Resistive Switching Memory Comprising p-Type SnO Bilayers

    KAUST Repository

    Hota, Mrinal Kanti

    2015-02-23

    Reproducible low-voltage bipolar resistive switching is reported in bilayer structures of p-type SnO films. Specifically, a bilayer homojunction comprising SnOx (oxygen-rich) and SnOy (oxygen-deficient) in nanoscale cross-point (300 × 300 nm2) architecture with self-compliance effect is demonstrated. By using two layers of SnO film, a good memory performance is obtained as compared to the individual oxide films. The memory devices show resistance ratio of 103 between the high resistance and low resistance states, and this difference can be maintained for up to 180 cycles. The devices also show good retention characteristics, where no significant degradation is observed for more than 103 s. Different charge transport mechanisms are found in both resistance states, depending on the applied voltage range and its polarity. The resistive switching is shown to originate from the oxygen ion migration and subsequent formation/rupture of conducting filaments.

  12. Improved thermoelectric efficiency in p-type ZnSb through Zn deficiency

    Science.gov (United States)

    Guo, Qilong; Luo, Sijun

    2015-12-01

    We herein report a feasible approach to improve the thermoelectric performance of p-type ZnSb compound by Zn content regulation. It is found that Zn vacancies formed by Zn deficiency not only efficiently enhance the electrical conductivity due to the improved hole concentration but also markedly lower the lattice thermal conductivity on account of the reinforced point defect scattering of phonons. The ZnSb compound with a nominal 3 mol.% Zn deficiency shows a maximum thermoelectric figure of merit ZT of 0.8 at 700 K which is a 60% improvement over the pristine sample. The strategies of further enhancing the performance of ZnSb-based material have been discussed.

  13. Origin of resistivity anomaly in p-type leads chalcogenide multiphase compounds

    Energy Technology Data Exchange (ETDEWEB)

    Aminorroaya Yamini, Sima, E-mail: sima@uow.edu.au, E-mail: jsnyder@caltech.edu; Dou, Shi Xue [Australian Institute for Innovative Materials (AIIM), Innovation Campus, University of Wollongong, NSW 2500 (Australia); Mitchell, David R. G. [Electron Microscopy Centre (EMC), Australian Institute for Innovative Materials (AIIM), Innovation Campus, University of Wollongong, NSW 2500 (Australia); Wang, Heng [Materials Science, California Institute of Technology, Pasadena, CA 91125 (United States); Gibbs, Zachary M. [Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, CA 91125 (United States); Pei, Yanzhong [School of Materials Science and Engineering, Tongji University, 4800 Caoan Road, Shanghai 201804 (China); Snyder, G. Jeffrey, E-mail: sima@uow.edu.au, E-mail: jsnyder@caltech.edu [Electron Microscopy Centre (EMC), Australian Institute for Innovative Materials (AIIM), Innovation Campus, University of Wollongong, NSW 2500 (Australia); ITMO University, Saint Petersburg (Russian Federation)

    2015-05-15

    The electrical resistivity curves for binary phase compounds of p-type lead chalcogenide (PbTe){sub (0.9−x)}(PbSe){sub 0.1}(PbS){sub x,} (x = 0.15, 0.2, 0.25), which contain PbS-rich secondary phases, show different behaviour on heating and cooling between 500-700 K. This is contrast to single phase compounds which exhibit similar behaviour on heating and cooling. We correlate these anomalies in the electrical resistivities of multiphase compounds to the variation in phase composition at high temperatures. The inhomogeneous distribution of dopants between the matrix and secondary phase is found to be crucial in the electronic transport properties of the multiphase compounds. These results can lead to further advances in designing composite Pb-chalcogenides with high thermoelectric performance.

  14. Photostable p-type dye-sensitized photoelectrochemical cells for water reduction.

    Science.gov (United States)

    Ji, Zhiqiang; He, Mingfu; Huang, Zhongjie; Ozkan, Umit; Wu, Yiying

    2013-08-14

    A photostable p-type NiO photocathode based on a bifunctional cyclometalated ruthenium sensitizer and a cobaloxime catalyst has been created for visible-light-driven water reduction to produce H2. The sensitizer is anchored firmly on the surface of NiO, and the binding is resistant to the hydrolytic cleavage. The bifunctional sensitizer can also immobilize the water reduction catalyst. The resultant photoelectrode exhibits superior stability in aqueous solutions. Stable photocurrents have been observed over a period of hours. This finding is useful for addressing the degradation issue in dye-sensitized photoelectrochemical cells caused by desorption of dyes and catalysts. The high stability of our photocathodes should be important for the practical application of these devices for solar fuel production.

  15. Phonon bottleneck in p-type Ge/Si quantum dots

    Energy Technology Data Exchange (ETDEWEB)

    Yakimov, A. I., E-mail: yakimov@isp.nsc.ru [Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Science, 630090 Novosibirsk (Russian Federation); Tomsk State University, 634050 Tomsk (Russian Federation); Kirienko, V. V.; Armbrister, V. A. [Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Science, 630090 Novosibirsk (Russian Federation); Bloshkin, A. A.; Dvurechenskii, A. V. [Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Science, 630090 Novosibirsk (Russian Federation); Novosibirsk State University, 630090 Novosibirsk (Russian Federation)

    2015-11-23

    We study the effect of quantum dot size on the mid-infrared photo- and dark current, photoconductive gain, and hole capture probability in ten-period p-type Ge/Si quantum dot heterostructures. The dot dimensions are varied by changing the Ge coverage and the growth temperature during molecular beam epitaxy of Ge/Si(001) system in the Stranski-Krastanov growth mode. In all samples, we observed the general tendency: with decreasing the size of the dots, the dark current and hole capture probability are reduced, while the photoconductive gain and photoresponse are enhanced. Suppression of the hole capture probability in small-sized quantum dots is attributed to a quenched electron-phonon scattering due to phonon bottleneck.

  16. Improved performance of P-type DSCs with a compact blocking layer coated by different thicknesses

    Science.gov (United States)

    Ho, Phuong; Bao, Le Quoc; Cheruku, Rajesh; Kim, Jae Hong

    2016-09-01

    The introduction of different thicknesses of a compact NiO blocking layer coating with different spin speeds on FTO and followed by a coating of photoactive NiO electrode for p-type dye-sensitized solar cells ( p-DSCs). This study examined the fabrication of a compact NiO blocking layer by decomposing an ethanolic precursor solution of nickel acetate tetrahydrate. The DCBZ dye used as the photosensitizer for the NiO electrode in the p-DSCs device and their performances have been analyzed. The enhancement of photovoltaic performance and resulted from an increase in the power conversion efficiency ( η). The electrochemical impedance spectroscopy (EIS) measurement demonstrated that charge recombination was suppressed when a compact NiO blocking layer was applied. The results showed that the best p-DSC was achieved by employing 3000 rpm spin-coated process for different times of blocking layer.

  17. Ge-intercalated graphene: The origin of the p-type to n-type transition

    KAUST Repository

    Kaloni, Thaneshwor P.

    2012-09-01

    Recently huge interest has been focussed on Ge-intercalated graphene. In order to address the effect of Ge on the electronic structure, we study Ge-intercalated free-standing C 6 and C 8 bilayer graphene, bulk C 6Ge and C 8Ge, as well as Ge-intercalated graphene on a SiC(0001) substrate, by density functional theory. In the presence of SiC(0001), there are three ways to obtain n-type graphene: i) intercalation between C layers; ii) intercalation at the interface to the substrate in combination with Ge deposition on the surface; and iii) cluster intercalation. All other configurations under study result in p-type states irrespective of the Ge coverage. We explain the origin of the different doping states and establish the conditions under which a transition occurs. © Copyright EPLA, 2012.

  18. Membrane Anchoring and Ion-Entry Dynamics in P-type ATPase Copper Transport

    DEFF Research Database (Denmark)

    Grønberg, Christina; Sitsel, Oleg; Lindahl, Erik

    2016-01-01

    Cu(+)-specific P-type ATPase membrane protein transporters regulate cellular copper levels. The lack of crystal structures in Cu(+)-binding states has limited our understanding of how ion entry and binding are achieved. Here, we characterize the molecular basis of Cu(+) entry using molecular......-dynamics simulations, structural modeling, and in vitro and in vivo functional assays. Protein structural rearrangements resulting in the exposure of positive charges to bulk solvent rather than to lipid phosphates indicate a direct molecular role of the putative docking platform in Cu(+) delivery. Mutational analyses...... and simulations in the presence and absence of Cu(+) predict that the ion-entry path involves two ion-binding sites: one transient Met148-Cys382 site and one intramembranous site formed by trigonal coordination to Cys384, Asn689, and Met717. The results reconcile earlier biochemical and x-ray absorption data...

  19. Inkjet printed circuits based on ambipolar and p-type carbon nanotube thin-film transistors

    Science.gov (United States)

    Kim, Bongjun; Geier, Michael L.; Hersam, Mark C.; Dodabalapur, Ananth

    2017-02-01

    Ambipolar and p-type single-walled carbon nanotube (SWCNT) thin-film transistors (TFTs) are reliably integrated into various complementary-like circuits on the same substrate by inkjet printing. We describe the fabrication and characteristics of inverters, ring oscillators, and NAND gates based on complementary-like circuits fabricated with such TFTs as building blocks. We also show that complementary-like circuits have potential use as chemical sensors in ambient conditions since changes to the TFT characteristics of the p-channel TFTs in the circuit alter the overall operating characteristics of the circuit. The use of circuits rather than individual devices as sensors integrates sensing and signal processing functions, thereby simplifying overall system design.

  20. Chemical synthesis of p-type nanocrystalline copper selenide thin films for heterojunction solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Ambade, Swapnil B. [Department of Chemical Engineering, Vishwakarma Institute of Technology, Pune 411037 (India); Mane, R.S. [Inorganic Nanomaterials Laboratory, Department of Chemistry, Hanyang University, Sungdong-Ku, Haengdang-dong 17, Seoul 133-791 (Korea, Republic of); Kale, S.S. [Inorganic Nanomaterials Laboratory, Department of Chemistry, Hanyang University, Sungdong-Ku, Haengdang-dong 17, Seoul 133-791 (Korea, Republic of); Sonawane, S.H. [Department of Chemical Engineering, Vishwakarma Institute of Technology, Pune 411037 (India); Shaikh, Arif V. [Department of Electronic Science, AKI' s Poona College of Arts, Science and Commerce, Camp, Pune 411 001 (India); Han, Sung-Hwan [Inorganic Nanomaterials Laboratory, Department of Chemistry, Hanyang University, Sungdong-Ku, Haengdang-dong 17, Seoul 133-791 (Korea, Republic of)]. E-mail: shhan@hanyang.ac.kr

    2006-12-15

    Nanocrystalline thin films of copper selenide have been grown on glass and tin doped-indium oxide substrates using chemical method. At ambient temperature, golden films have been synthesized and annealed at 200 deg. C for 1 h and were examined for their structural, surface morphological and optical properties by means of X-ray diffraction (XRD), scanning electron microscopy and UV-vis spectrophotometry techniques, respectively. Cu{sub 2-x}Se phase was confirmed by XRD pattern and spherical grains of 30 {+-} 4 - 40 {+-} 4 nm in size aggregated over about 130 {+-} 10 nm islands were seen by SEM images. Effect of annealing on crystallinity improvement, band edge shift and photoelectrochemical performance (under 80 mW/cm{sup 2} light intensity and in lithium iodide electrolyte) has been studied and reported. Observed p-type electrical conductivity in copper selenide thin films make it a suitable candidate for heterojunction solar cells.

  1. Bulk and Surface Event Identification in p-type Germanium Detectors

    CERN Document Server

    Yang, L T; Jia, L P; Jiang, H; Li, J; Lin, F K; Lin, S T; Liu, S K; Ma, J L; Sharma, V; Singh, L; Singh, M K; Soma, A K; Yang, S W; Wang, L; Wang, Q; Wong, H T; Yue, Q; Zhao, W

    2016-01-01

    The p-type point-contact germanium detectors, due to its sub-keV sensitivities and low internal radioactivity background, are demonstrated to be competitive tools for light dark matter WIMPs searches and may have potential applications in neutrino physics. These detectors exhibit anomalous surface behavior, which has been characterized and dealt with in previous analysis. However, the analysis method rely on spectral shape assumptions and must use external calibration sources. In this report, we purpose an improved method, where in situ data could be used as calibration sources. Data from CDEX-1 and TEXONO experiments will be re-examined and the results are shown to be consistent with both analysis.

  2. Wide bandgap n-type and p-type semiconductor porous junction devices as photovoltaic cells

    Energy Technology Data Exchange (ETDEWEB)

    Lin, Yuan-Pai; Horng, Sheng-Fu [Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 300, Taiwan (China); Chao, Yu-Chiang; Meng, Hsin-Fei [Institute of Physics, National Chiao Tung University, Hsinchu 300, Taiwan (China); Zan, Hsiao-Wen, E-mail: yuchiangchao@gmail.com, E-mail: meng@mail.nctu.edu.tw [Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu 300, Taiwan (China)

    2011-10-12

    In junction absorber photovoltaics doped wide bandgap n-type and p-type semiconductors form a porous interpenetrating junction structure with a layer of low bandgap absorber at the interface. The doping concentration is high enough such that the junction depletion width is smaller than the pore size. The highly conductive neutral region then has a dentrite shape with fingers reaching the absorber to effectively collect the photo-carriers swept out by the junction electric field. With doping of 10{sup 19} cm{sup -3} corresponding to a depletion width of 25 nm, pore size of 32 nm, absorber thickness close to exciton diffusion length of 17 nm, absorber bandgap of 1.4 eV and carrier mobility over 10{sup -5} cm{sup 2} V{sup -1} s{sup -1}, numerical calculation shows the power conversion efficiency is as high as 19.4%. It rises to 23% for a triplet exciton absorber.

  3. Chemical Composition of Nanoporous Layer Formed by Electrochemical Etching of p-Type GaAs

    Science.gov (United States)

    Bioud, Youcef A.; Boucherif, Abderraouf; Belarouci, Ali; Paradis, Etienne; Drouin, Dominique; Arès, Richard

    2016-10-01

    We have performed a detailed characterization study of electrochemically etched p-type GaAs in a hydrofluoric acid-based electrolyte. The samples were investigated and characterized through cathodoluminescence (CL), X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDX), and X-ray photoelectron spectroscopy (XPS). It was found that after electrochemical etching, the porous layer showed a major decrease in the CL intensity and a change in chemical composition and in the crystalline phase. Contrary to previous reports on p-GaAs porosification, which stated that the formed layer is composed of porous GaAs, we report evidence that the porous layer is in fact mainly constituted of porous As2O3. Finally, a qualitative model is proposed to explain the porous As2O3 layer formation on p-GaAs substrate.

  4. InP nanowire p-type doping via Zinc indiffusion

    Science.gov (United States)

    Haggren, Tuomas; Otnes, Gaute; Mourão, Renato; Dagyte, Vilgaile; Hultin, Olof; Lindelöw, Fredrik; Borgström, Magnus; Samuelson, Lars

    2016-10-01

    We report an alternative pathway for p-type InP nanowire (NW) doping by diffusion of Zn species from the gas phase. The diffusion of Zn was performed in a MOVPE reactor at 350-500 °C for 5-20 min with either H2 environment or additional phosphorus in the atmosphere. In addition, Zn3P2 shells were studied as protective caps during post-diffusion annealing. This post-diffusion annealing was performed to outdiffuse and activate Zn in interstitial locations. The characterization methods included photoluminescence and single NW conductivity and carrier concentration measurements. The acquired carrier concentrations were in the order of >1017 cm-3 for NWs without post-annealing, and up to 1018 cm-3 for NWs annealed with the Zn3P2 shells. The diffused Zn caused redshift to the photoluminescence signal, and the degree of redshift depended on the diffusion process.

  5. Inkjet printed circuits based on ambipolar and p-type carbon nanotube thin-film transistors

    Science.gov (United States)

    Kim, Bongjun; Geier, Michael L.; Hersam, Mark C.; Dodabalapur, Ananth

    2017-01-01

    Ambipolar and p-type single-walled carbon nanotube (SWCNT) thin-film transistors (TFTs) are reliably integrated into various complementary-like circuits on the same substrate by inkjet printing. We describe the fabrication and characteristics of inverters, ring oscillators, and NAND gates based on complementary-like circuits fabricated with such TFTs as building blocks. We also show that complementary-like circuits have potential use as chemical sensors in ambient conditions since changes to the TFT characteristics of the p-channel TFTs in the circuit alter the overall operating characteristics of the circuit. The use of circuits rather than individual devices as sensors integrates sensing and signal processing functions, thereby simplifying overall system design. PMID:28145438

  6. Luminescence properties of p-type thin CdS films prepared by laser ablation

    Energy Technology Data Exchange (ETDEWEB)

    Ullrich, B. [Tokyo Univ. (Japan). Dept. of Physics; Ezumi, H. [Department of Electrical Engineering, Hiroshima-Denki Institute of Technology, Hiroshima 739-03 (Japan); Keitoku, S. [Hiroshima Women`s University, Hiroshima 734 (Japan); Kobayashi, T. [Tokyo Univ. (Japan). Dept. of Physics

    1995-12-01

    Investigations of the luminescence of p-type CdS:Cu thin (less than or equal to 2 {mu}m) films on glass substrate prepared by laser ablation were performed for the first time. The dependences of the luminescence on the Cu content in the thin films were studied at 300 K with argon laser lines at 457.9 nm, 488.0 nm and 514.5 nm. It is demonstrated that the luminescence excited with the 514.5 nm line corresponds to the donor-acceptor transition. Furthermore, it is shown that the intensity of the red emission of CdS:Cu films can be efficiently bleached by Cu doping. (orig.)

  7. Inkjet printed circuits based on ambipolar and p-type carbon nanotube thin-film transistors.

    Science.gov (United States)

    Kim, Bongjun; Geier, Michael L; Hersam, Mark C; Dodabalapur, Ananth

    2017-02-01

    Ambipolar and p-type single-walled carbon nanotube (SWCNT) thin-film transistors (TFTs) are reliably integrated into various complementary-like circuits on the same substrate by inkjet printing. We describe the fabrication and characteristics of inverters, ring oscillators, and NAND gates based on complementary-like circuits fabricated with such TFTs as building blocks. We also show that complementary-like circuits have potential use as chemical sensors in ambient conditions since changes to the TFT characteristics of the p-channel TFTs in the circuit alter the overall operating characteristics of the circuit. The use of circuits rather than individual devices as sensors integrates sensing and signal processing functions, thereby simplifying overall system design.

  8. Asymptotics of the trap-dominated Gunn effect in p-type Ge

    Science.gov (United States)

    Bonilla, L. L.; Hernando, P. J.; Herrero, M. A.; Kindelan, M.; Velázquez, J. J. L.

    1997-09-01

    We present an asymptotic analysis of the Gunn effect in a drift-diffusion model - including electric-field-dependent generation-recombination processes - for long samples of strongly compensated p-type Ge at low temperature and under d.c. voltage bias. During each Gunn oscillation, there are different stages corresponding to the generation, motion and annihilation of solitary waves. Each stage may be described by one evolution equation for only one degree of freedom (the current density), except for the generation of each new wave. The wave generation is a faster process that may be described by solving a semiinfinite canonical problem. As a result of our study we have found that (depending on the boundary condition) one or several solitary waves may be shed during each period of the oscillation. Examples of numerical simulations validating our analysis are included.

  9. Laser-zone Growth in a Ribbon-to-ribbon (RTR) Process Silicon Sheet Growth Development for the Large Area Silicon Sheet Task of the Low Cost Solar Array Project

    Science.gov (United States)

    Baghdadi, A.; Gurtler, R. W.; Legge, R.; Sopori, B.; Rice, M. J.; Ellis, R. J.

    1979-01-01

    A technique for growing limited-length ribbons continually was demonstrated. This Rigid Edge technique can be used to recrystallize about 95% of the polyribbon feedstock. A major advantage of this method is that only a single, constant length silicon ribbon is handled throughout the entire process sequence; this may be accomplished using cassettes similar to those presently in use for processing Czochralski waters. Thus a transition from Cz to ribbon technology can be smoothly affected. The maximum size being considered, 3 inches x 24 inches, is half a square foot, and will generate 6 watts for 12% efficiency at 1 sun. Silicon dioxide has been demonstrated as an effective, practical diffusion barrier for use during the polyribbon formation.

  10. Large area growth and electrical properties of p-type WSe2 atomic layers.

    Science.gov (United States)

    Zhou, Hailong; Wang, Chen; Shaw, Jonathan C; Cheng, Rui; Chen, Yu; Huang, Xiaoqing; Liu, Yuan; Weiss, Nathan O; Lin, Zhaoyang; Huang, Yu; Duan, Xiangfeng

    2015-01-14

    Transition metal dichacogenides represent a unique class of two-dimensional layered materials that can be exfoliated into single or few atomic layers. Tungsten diselenide (WSe(2)) is one typical example with p-type semiconductor characteristics. Bulk WSe(2) has an indirect band gap (∼ 1.2 eV), which transits into a direct band gap (∼ 1.65 eV) in monolayers. Monolayer WSe(2), therefore, is of considerable interest as a new electronic material for functional electronics and optoelectronics. However, the controllable synthesis of large-area WSe(2) atomic layers remains a challenge. The studies on WSe(2) are largely limited by relatively small lateral size of exfoliated flakes and poor yield, which has significantly restricted the large-scale applications of the WSe(2) atomic layers. Here, we report a systematic study of chemical vapor deposition approach for large area growth of atomically thin WSe(2) film with the lateral dimensions up to ∼ 1 cm(2). Microphotoluminescence mapping indicates distinct layer dependent efficiency. The monolayer area exhibits much stronger light emission than bilayer or multilayers, consistent with the expected transition to direct band gap in the monolayer limit. The transmission electron microscopy studies demonstrate excellent crystalline quality of the atomically thin WSe(2). Electrical transport studies further show that the p-type WSe(2) field-effect transistors exhibit excellent electronic characteristics with effective hole carrier mobility up to 100 cm(2) V(-1) s(-1) for monolayer and up to 350 cm(2) V(-1) s(-1) for few-layer materials at room temperature, comparable or well above that of previously reported mobility values for the synthetic WSe(2) and comparable to the best exfoliated materials.

  11. Iron-oxygen interaction in silicon: A combined XBIC/XRF-EBIC-DLTS study of precipitation and complex building

    Energy Technology Data Exchange (ETDEWEB)

    Trushin, M., E-mail: trushmax@tu-cottbus.d [IHP/BTU Jointlab, Konrad-Wachsmann Allee 1, 03046 Cottbus (Germany); Vyvenko, O. [V.A.Fok Institute of Physics, St. Petersburg State University, Ulyanovskaya 1, 108594 St. Petersburg (Russian Federation); Seifert, W. [IHP/BTU Jointlab, Konrad-Wachsmann Allee 1, 03046 Cottbus (Germany); IHP microelectronics, Im Technologiepark 25, D-15236 Frankfurt (Oder) (Germany); Jia, G. [IHP/BTU Jointlab, Konrad-Wachsmann Allee 1, 03046 Cottbus (Germany); Kittler, M. [IHP/BTU Jointlab, Konrad-Wachsmann Allee 1, 03046 Cottbus (Germany); IHP microelectronics, Im Technologiepark 25, D-15236 Frankfurt (Oder) (Germany)

    2009-12-15

    Iron-oxygen interaction in the Czochralski-grown silicon (CZ-Si) giving rise to their final precipitated state was investigated by means of a combination of electrical and element-sensitive techniques. The samples studied were intentionally contaminated with iron at 1150 deg. C and then they were annealed at temperatures of 850 and 950 deg. C to stimulate precipitate formation. Fe-related defect levels in silicon band gap and spatial distributions of iron-related precipitates were monitored after each annealing step. It was found that FeB-pairs being the dominant defects in as-contaminated sample transformed completely to the stable FeO-related complexes that served as precursors for further iron-oxygen co-precipitation.

  12. Iron-oxygen interaction in silicon: A combined XBIC/XRF-EBIC-DLTS study of precipitation and complex building

    Science.gov (United States)

    Trushin, M.; Vyvenko, O.; Seifert, W.; Jia, G.; Kittler, M.

    2009-12-01

    Iron-oxygen interaction in the Czochralski-grown silicon (CZ-Si) giving rise to their final precipitated state was investigated by means of a combination of electrical and element-sensitive techniques. The samples studied were intentionally contaminated with iron at 1150 °C and then they were annealed at temperatures of 850 and 950 °C to stimulate precipitate formation. Fe-related defect levels in silicon band gap and spatial distributions of iron-related precipitates were monitored after each annealing step. It was found that FeB-pairs being the dominant defects in as-contaminated sample transformed completely to the stable FeO-related complexes that served as precursors for further iron-oxygen co-precipitation.

  13. Reliability of Czochralski-grown {beta}-BaB{sub 2}O{sub 4}(BBO) devices

    Energy Technology Data Exchange (ETDEWEB)

    Umezu, Nobuhiko; Fukui, Tatsuo; Okamoto, Tsutomu; Wada, Hiroyuki; Tatsuki, Kouichi; Kondo, Kenji; Kubota, Shigeo [Sony Corp., Tokyo (Japan)

    1998-03-01

    We have achieved more than 1000 hours-operation in 266 nm-continuous wave (CW), 100 mW-generation of all-solid-state-UV laser system using Czochralski (Cz)-grown {beta}-BaB{sub 2}O{sub 4}(BBO) crystal devices. Absorption of the Cz-grown crystal for e-ray at 266 nm was improved to 1%/cm, which is one-third lower than that of the crystal grown by top seeded solution growth (TSSG) method. Degradation rate of 266 nm generation, using 7 kHz repetition rate laser diode pumped Q switched Nd:YAG laser as a fundamental light source, was one order of magnitude lower than that of TSSG-crystal. Surface roughness of the crystal was better than 0.3 rms.-nm. HfO{sub 2} film with extremely high adhesion was deposited on the surfaces using reactive low voltage ion plating method. Our devices can be put to practical use in areas of photolithography, micro fabrication, material processing and ultra high density optical disk mastering. (author)

  14. Czochralski growth of 2 in. Ce-doped (La,Gd)2Si2O7 for scintillator application

    Science.gov (United States)

    Yoshikawa, Akira; Shoji, Yasuhiro; Kurosawa, Shunsuke; Chani, Valery I.; Murakami, Rikito; Horiai, Takahiko; Kamada, Kei; Yokota, Yuui; Ohashi, Yuji; Kochurikhin, Vladimir

    2016-10-01

    Growth of 2-in. diameter Ce-doped (La,Gd)2Si2O7 (La-GPS) scintillating crystals by Czochralski method using Ir crucible is reported. The composition of the host material was approximately equal to La0.5Gd1.5Si2O7 and the concentration of the Ce3+-activator was either 0.5 or 1.5 at.% with respect to the total content of the rare-earths forming the host crystal matrix. Effects of the hot zone construction including inductive coil position, presence/absence of the after-heater, rotation rate and other growth parameters on the crystal quality are discussed in some details. The crystals produced in optimized conditions were colorless, transparent, uniform in their shape, crack- and inclusions-free, and demonstrated smooth glass-like surface. The length of the crystals' cylindrically-shaped body parts exceed 100 mm. The growth results were well reproducible. The main disadvantage of the growth process is associated with short lifetime of the Ir crucible and its deformation caused by thermal expansion of the pre-solidified melt at each heating stage.

  15. Numerical simulation of convection and heat transfer in Czochralski crystal growth by multiple-relaxation-time LBM

    Science.gov (United States)

    Liu, Ding; Huang, Weichao; Zhang, Ni

    2017-07-01

    A two-dimensional axisymmetric swirling model based on the lattice Boltzmann method (LBM) in a pseudo Cartesian coordinate system is posited to simulate Czochralski (Cz) crystal growth in this paper. Specifically, the multiple-relaxation-time LBM (MRT-LBM) combined with the finite difference method (FDM) is used to analyze the melt convection and heat transfer in the process of Cz crystal growth. An incompressible axisymmetric swirling MRT-LB D2Q9 model is applied to solve for the axial and radial velocities by inserting thermal buoyancy and rotational inertial force into the two-dimensional lattice Boltzmann equation. In addition, the melt temperature and the azimuthal velocity are solved by MRT-LB D2Q5 models, and the crystal temperature is solved by FDM. The comparison results of stream functions values of different methods demonstrate that our hybrid model can be used to simulate the fluid-thermal coupling in the axisymmetric swirling model correctly and effectively. Furthermore, numerical simulations of melt convection and heat transfer are conducted under the conditions of high Grashof (Gr) numbers, within the range of 105 ˜ 107, and different high Reynolds (Re) numbers. The experimental results show our hybrid model can obtain the exact solution of complex crystal-growth models and analyze the fluid-thermal coupling effectively under the combined action of natural convection and forced convection.

  16. Numerical Simulation of Yttrium Aluminum Garnet(YAG) Single Crystal Growth by Resistance Heating Czochralski(CZ) Method

    Energy Technology Data Exchange (ETDEWEB)

    You, Myeong Hyeon; Cha, Pil Ryung [Kookmin University, Seoul (Korea, Republic of)

    2017-01-15

    Yttrium Aluminum Garnet (YAG) single crystal has received much attention as the high power solid-state laser’s key component in industrial and medical applications. Various growth methods have been proposed, and currently the induction-heating Czochralski (IHCZ) growth method is mainly used to grow YAG single crystal. Due to the intrinsic properties of the IHCZ method, however, the solid/liquid interface has a downward convex shape and a sharp tip at the center, which causes a core defect and reduces productivity. To produce YAG single crystals with both excellent quality and higher yield, it is essential to control the core defects. In this study, using computer simulations we demonstrate that the resistance-heating CZ (RHCZ) method may avoid a downward convex interface and produce core defect free YAG single crystal. We studied the effects of various design parameters on the interface shape and found that there was an optimum combination of design parameter and operating conditions that produced a flat solid-liquid interface.

  17. Correlation between steady-oscillatory flow transition and the interface inversion process during the Czochralski growth of semitransparent oxide crystal

    Science.gov (United States)

    Faiez, Reza; Rezaei, Yazdan

    2016-12-01

    In this paper, steady-oscillatory transition of the convective flow in a Czochralski (Cz) growth system was numerically studied. In this configuration, rapid variations in density across narrow region of the flow in the vicinity of the crystallization front leads to an unstable stratification of the flow in this region. Time-dependent, finite volume method calculation of the momentum and heat transport equations shows that an instability mechanism, giving rise to the formation of cold plumes beneath the phase boundary, might be associated with an irreversible change in the convexity of the front. Dynamics of the crystallization front was found to be correlated with the periodic oscillation of the flow. It was shown that the interface inversion process occurs at a critical Reynolds number significantly (˜25%) lower than that predicted by the steady-state Cz-oxide model analysis. Consistently, the time-averaged maximum value of stream function was found to be larger than its corresponding steady-state value. This indicates that the mechanism behind the oscillatory transition of the flow has a positive feedback on the intensity of forced convection flow. These numerical results were attributed to the baroclinic instability mechanism characterized by oscillations of a cold plume appearing at the crystal periphery and descending along the symmetry axis. The time period of oscillations was found to be considerably (30-40%) decreases and, simultaneously, the inclination angle of isopycnals increases (˜48%) at a critical rotation rate of the crystal for which the interface inversion occurs.

  18. Numerical simulation of convection and heat transfer in Czochralski crystal growth by multiple-relaxation-time LBM

    Directory of Open Access Journals (Sweden)

    Ding Liu

    2017-07-01

    Full Text Available A two-dimensional axisymmetric swirling model based on the lattice Boltzmann method (LBM in a pseudo Cartesian coordinate system is posited to simulate Czochralski (Cz crystal growth in this paper. Specifically, the multiple-relaxation-time LBM (MRT-LBM combined with the finite difference method (FDM is used to analyze the melt convection and heat transfer in the process of Cz crystal growth. An incompressible axisymmetric swirling MRT-LB D2Q9 model is applied to solve for the axial and radial velocities by inserting thermal buoyancy and rotational inertial force into the two-dimensional lattice Boltzmann equation. In addition, the melt temperature and the azimuthal velocity are solved by MRT-LB D2Q5 models, and the crystal temperature is solved by FDM. The comparison results of stream functions values of different methods demonstrate that our hybrid model can be used to simulate the fluid-thermal coupling in the axisymmetric swirling model correctly and effectively. Furthermore, numerical simulations of melt convection and heat transfer are conducted under the conditions of high Grashof (Gr numbers, within the range of 105 ∼ 107, and different high Reynolds (Re numbers. The experimental results show our hybrid model can obtain the exact solution of complex crystal-growth models and analyze the fluid-thermal coupling effectively under the combined action of natural convection and forced convection.

  19. Recent progress in oxide scintillation crystals development by low-thermal gradient Czochralski technique for particle physics experiments

    Science.gov (United States)

    Shlegel, V. N.; Borovlev, Yu. A.; Grigoriev, D. N.; Grigorieva, V. D.; Danevich, F. A.; Ivannikova, N. V.; Postupaeva, A. G.; Vasiliev, Ya. V.

    2017-08-01

    Modern particle physics experiments call for high performance scintillation detectors with unique properties: radiation-resistant in high energy and astrophysics, highly radiopure, containing certain elements or enriched isotopes in astroparticle physics. The low-thermal gradient Czochralski (LTG CZ) crystal growth technique provides excellent quality large volume radiopure crystal scintillators. Absence of thermoelastic stress in the crystal and overheating of the melt in the LTG CZ method is particularly significant in production of crystalline materials with strong thermal anisotropic properties and low mechanical strength, with a very high yield of crystalline boules and low losses of initial charge, crucially important in production of crystal scintillators from enriched isotopes for double beta decay experiments. Here we discuss progress in development of the well known scintillators (Bi4Ge3O12 (BGO), CdWO4, ZnWO4, CaMoO4, PbMoO4), as well as R&D of new materials (ZnMoO4, Li2MoO4, Na2Mo2O7) for the next generation experiments in particle physics.

  20. Modified low temperature Czochralski growth of xylenol orange doped benzopheone single crystal for fabricating dual band patch antenna

    Science.gov (United States)

    Yadav, Harsh; Sinha, Nidhi; Kumar, Binay

    2016-09-01

    Organic non-linear optical pure and xylenol orange (XO) doped benzophenone (BP) single crystals have been grown by a modified Czochralski technique. A low cost CZ system was designed and fabricated that is suitable for the growth of single crystals of low melting point organic materials. Structural analysis was performed by powder and single crystal XRD. LC-HRMS spectra reveal that the dye molecules are present in the doped crystal. The linear optical characterization was carried out by UV-vis spectroscopy. In the case of the XO doped BP crystal, two absorption peaks were found at 504 nm and 620 nm. The enhancement of photoluminescence intensity of blue emission was observed in the dye doped crystal. Dielectric studies reveal that the XO doped BP has shown improved a dielectric constant with low dielectric loss. A dual band compact circular patch antenna was simulated and fabricated using the XO doped crystal. Resonant frequencies of the dual bands at 4.80 GHz and 9.22 GHz were achieved by introducing a defect ground state in the circular patch antenna. The piezoelectric coefficient (d33) value was increased from 1 to 4 pC/N by XO dye doping, which opens up the possibilities of simultaneous transducer applications.

  1. Czochralski growth of Gd3(Al5-xGax)O12 (GAGG) single crystals and their scintillation properties

    Science.gov (United States)

    Kurosawa, Shunsuke; Shoji, Yasuhiro; Yokota, Yuui; Kamada, Kei; Chani, Valery I.; Yoshikawa, Akira

    2014-05-01

    Ce:Gd3(AlxGa1-x)5O12 (x=2.5/5 and 3/5, Ce:GAGG-2.5 and Ce:GAGG-3) crystals were grown by the Czochralski process in order to reduce cost of the starting materials as compared with conventional Ce:Gd3Al2Ga3O12 (Ce:GAGG-2) crystal which have high light output. Although perovskite phase was detected in Ce:GAGG-3, Ce:GAGG-2.5 had single-phase garnet structure. Solidification fraction for the Ce:GAGG-2.5 growth was 0.52. Optical properties including transmittance, emission, and excitation spectra of 30 samples cut from the Ce:GAGG-2.5 bulk ingot did not depend on their original position along the growth axis. These samples had light outputs of approximately 58,000±3000 photons/MeV. However, scintillation decay times varied from 140 to 200 ns and depended on the position clearly.

  2. Numerical methods for determining interstitial oxygen in silicon

    Energy Technology Data Exchange (ETDEWEB)

    Stevenson, J.O.; Medernach, J.W.

    1995-01-01

    The interstitial oxygen (O{sub i}) concentration in Czochralski silicon and the subsequent SiO{sub x} precipitation are important parameters for integrated circuit fabrication. Uncontrolled SiO{sub x} precipitation during processing can create detrimental mechanical and electrical effects that contribute to poor performance. An inability to consistently and accurately measure the initial O{sub i} concentration in heavily doped silicon has led to contradictory results regarding the effects of dopant type and concentration on SiO{sub x} precipitation. The authors have developed a software package for reliably determining and comparing O{sub i} in heavily doped silicon. The SiFTIR{copyright} code implements three independent oxygen analysis methods in a single integrated package. Routine oxygen measurements are desirable over a wide range of silicon resistivities, but there has been confusion concerning which of the three numerical methods is most suitable for the low resistivity portion of the continuum. A major strength of the software is an ability to rapidly produce results for all three methods using only a single Fourier Transform Infrared Spectroscopy (FTIR) spectrum as input. This ability to perform three analyses on a single data set allows a detailed comparison of the three methods across the entire range of resistivities in question. Integrated circuit manufacturers could use the enabling technology provided by SiFTIR{copyright} to monitor O{sub i} content. Early detection of O{sub i} using this diagnostic could be beneficial in controlling SiO{sub x} precipitation during integrated circuit processing.

  3. Sputtering deposition of P-type SnO films with SnO₂ target in hydrogen-containing atmosphere.

    Science.gov (United States)

    Hsu, Po-Ching; Hsu, Chao-Jui; Chang, Ching-Hsiang; Tsai, Shiao-Po; Chen, Wei-Chung; Hsieh, Hsing-Hung; Wu, Chung-Chih

    2014-08-27

    In this work, we had investigated sputtering deposition of p-type SnO using the widely used and robust SnO2 target in a hydrogen-containing reducing atmosphere. The effects of the hydrogen-containing sputtering gas on structures, compositions, optical, and electrical properties of deposited SnOx films were studied. Results show that polycrystalline and SnO-dominant films could be readily obtained by carefully controlling the hydrogen gas ratio in the sputtering gas and the extent of reduction reaction. P-type conductivity was unambiguously observed for SnO-dominant films with traceable Sn components, exhibiting a p-type Hall mobility of up to ∼3 cm(2) V(-1) s(-1). P-type SnO thin-film transistors using such SnO-dominant films were also demonstrated.

  4. Ambipolar Organic Phototransistors with p-Type/n-Type Conjugated Polymer Bulk Heterojunction Light-Sensing Layers

    KAUST Repository

    Nam, Sungho

    2016-11-18

    Ambipolar organic phototransistors with sensing channel layers, featuring p-type and n-type conjugated polymer bulk heterojunctions, exhibit outstanding light-sensing characteristics in both p-channel and n-channel sensing operation modes.

  5. Surface modifications caused by a swift heavy ion irradiation on crystalline p-type gallium antimonide

    Energy Technology Data Exchange (ETDEWEB)

    Jadhav, Vidya, E-mail: vj1510@yahoo.com

    2015-09-01

    Surface modifications caused by a swift heavy ion irradiation on crystalline p-type gallium antimonide crystal have been reported. Single crystal, 1 0 0〉 orientations and ∼500 μm thick p-type GaSb samples with carrier concentration of 3.30 × 10{sup 17} cm{sup −3} were irradiated at 100 MeV Fe{sup 7+} ions. We have used 15UD Pelletron facilities at IUAC with varying fluences of 5 × 10{sup 10}–1 × 10{sup 14} ions cm{sup −2}. The effects of irradiation on these samples have been investigated using, spectroscopic ellipsometry, atomic force microscopy and ultraviolet–visible–NIR spectroscopy techniques. Ellipsometry parameters, psi (Ψ) and delta (Δ) for the unirradiated sample and samples irradiated with different fluences were recorded. The data were fit to a three phase model to determine the refractive index and extinction coefficient. The refractive index and extinction coefficient for various fluences in ultraviolet, visible, and infrared, regimes were evaluated. Atomic force microscopy has been used to study these surface modifications. In order to have more statistical information about the surface, we have plotted the height structure histogram for all the samples. For unirradiated sample, we observed the Gaussian fitting. This result indicates the more ordered height structure symmetry. Whereas for the sample irradiated with the fluence of 1 × 10{sup 13}, 5 × 10{sup 13} and 1 × 10{sup 14} ions cm{sup −2}, we observed the scattered data. The width of the histogram for samples irradiated up to the fluence of 1 × 10{sup 13} ion cm{sup −2} was found to be almost same however it decreased at higher fluence. UV reflectance spectra of the sample irradiated with increasing fluences exhibit three peaks at 292, 500 and 617 nm represent the high energy GaSb; E{sub 1}, E{sub 1} + Δ and E{sub 2} band gaps in all irradiated samples.

  6. Au-assisted electroless etching of silicon in aqueous HF/H{sub 2}O{sub 2} solution

    Energy Technology Data Exchange (ETDEWEB)

    Megouda, Nacera [Faculte des Sciences, Universite Mouloud Mammeri, Tizi-Ouzou (Algeria); Hadjersi, Toufik, E-mail: hadjersi@yahoo.com [Unite de Developpement de la Technologie du Silicium (UDTS), 2, Bd. Frantz Fanon, B.P. 140 Alger-7 merveilles, Alger (Algeria); Piret, Gaelle; Boukherroub, Rabah [Institut de Recherche Interdisciplinaire (IRI, USR 3078) and Institut d' Electronique, de Microelectronique et de Nanotechnologie (IEMN, CNRS-8520), Cite Scientifique, Avenue Poincare - B.P. 60069, 59652 Villeneuve d' Ascq (France); Elkechai, Omar [Faculte des Sciences, Universite Mouloud Mammeri, Tizi-Ouzou (Algeria)

    2009-04-01

    The Au-assisted electroless etching of p-type silicon substrate in HF/H{sub 2}O{sub 2} solution at 50 deg. C was investigated. The dependence of the crystallographic orientation, the concentration of etching solution and the silicon resistivity on morphology of etched layer was studied. The layers formed on silicon were investigated by scanning electron microscopy (SEM). It was demonstrated that although the deposited Au on silicon is a continuous film, it can produce a layer of silicon nanowires or macropores depending on the used solution concentration.

  7. 22.5% efficient silicon heterojunction solar cell with molybdenum oxide hole collector

    Energy Technology Data Exchange (ETDEWEB)

    Geissbühler, Jonas, E-mail: jonas.geissbuehler@epfl.ch; Werner, Jérémie; Martin de Nicolas, Silvia; Hessler-Wyser, Aïcha; Tomasi, Andrea; Niesen, Bjoern; De Wolf, Stefaan [Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), École Polytechnique Fédérale de Lausanne (EPFL), Rue de la Maladière 71b, CH-2000 Neuchâtel (Switzerland); Barraud, Loris; Despeisse, Matthieu; Nicolay, Sylvain [CSEM PV-Center, Jaquet-Droz 1, CH-2000 Neuchâtel (Switzerland); Ballif, Christophe [Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), École Polytechnique Fédérale de Lausanne (EPFL), Rue de la Maladière 71b, CH-2000 Neuchâtel (Switzerland); CSEM PV-Center, Jaquet-Droz 1, CH-2000 Neuchâtel (Switzerland)

    2015-08-24

    Substituting the doped amorphous silicon films at the front of silicon heterojunction solar cells with wide-bandgap transition metal oxides can mitigate parasitic light absorption losses. This was recently proven by replacing p-type amorphous silicon with molybdenum oxide films. In this article, we evidence that annealing above 130 °C—often needed for the curing of printed metal contacts—detrimentally impacts hole collection of such devices. We circumvent this issue by using electrodeposited copper front metallization and demonstrate a silicon heterojunction solar cell with molybdenum oxide hole collector, featuring a fill factor value higher than 80% and certified energy conversion efficiency of 22.5%.

  8. Few-Layer MoS₂ p-Type Devices Enabled by Selective Doping Using Low Energy Phosphorus Implantation.

    Science.gov (United States)

    Nipane, Ankur; Karmakar, Debjani; Kaushik, Naveen; Karande, Shruti; Lodha, Saurabh

    2016-02-23

    P-type doping of MoS2 has proved to be a significant bottleneck in the realization of fundamental devices such as p-n junction diodes and p-type transistors due to its intrinsic n-type behavior. We report a CMOS compatible, controllable and area selective phosphorus plasma immersion ion implantation (PIII) process for p-type doping of MoS2. Physical characterization using SIMS, AFM, XRD and Raman techniques was used to identify process conditions with reduced lattice defects as well as low surface damage and etching, 4X lower than previous plasma based doping reports for MoS2. A wide range of nondegenerate to degenerate p-type doping is demonstrated in MoS2 field effect transistors exhibiting dominant hole transport. Nearly ideal and air stable, lateral homogeneous p-n junction diodes with a gate-tunable rectification ratio as high as 2 × 10(4) are demonstrated using area selective doping. Comparison of XPS data from unimplanted and implanted MoS2 layers shows a shift of 0.67 eV toward lower binding energies for Mo and S peaks indicating p-type doping. First-principles calculations using density functional theory techniques confirm p-type doping due to charge transfer originating from substitutional as well as physisorbed phosphorus in top few layers of MoS2. Pre-existing sulfur vacancies are shown to enhance the doping level significantly.

  9. High performance p-type NiOx thin-film transistor by Sn doping

    Science.gov (United States)

    Lin, Tengda; Li, Xiuling; Jang, Jin

    2016-06-01

    Major obstacles towards power efficient complementary electronics employing oxide thin-film transistors (TFTs) lie in the lack of equivalent well performing p-channel devices. Here, we report a significant performance enhancement of solution-processed p-type nickel oxide (NiOx) TFTs by introducing Sn dopant. The Sn-doped NiOx (Sn-NiOx) TFTs annealed at 280 °C demonstrate substantially improved electrical performances with the increase in the on/off current ratio (Ion/Ioff) by ˜100 times, field-effect mobility (μlin) by ˜3 times, and the decrease in subthreshold swing by half, comparing with those of pristine NiOx TFTs. X-ray photoelectron spectroscopy and X-ray diffraction results confirm that Sn atoms tend to substitute Ni sites and induce more amorphous phase. A decrease in density of states in the gap of NiOx by Sn doping and the shift of Fermi level (EF) into the midgap lead to the improvements of TFT performances. As a result, Sn-NiOx can be a promising material for the next-generation, oxide-based electronics.

  10. p-Type CuYO{sub 2} as hydrogen photocathode

    Energy Technology Data Exchange (ETDEWEB)

    Trari, M.; Bouguelia, A.; Bessekhouad, Y. [Laboratoire de Stockage et de Valorisation des Energies Renouvelables, BP 32 El-Alia 16311, Algiers (Algeria)

    2006-01-23

    A new photochemical system based on a CuYO{sub 2} dispersion in aqueous S{sup 2-} or SO{sub 3}{sup 2-} solution as hole scavengers is proposed. The delafossite CuYO{sub 2}, doped with calcium, is a low p-type semiconductor with a hole mobility of 7.3x10{sup -7}m{sup 2}V{sup -1}s{sup -1}. The band gap is 3.50eV and the transition is directly allowed. The valence band edge, located at 5.23eV below vacuum, is made up from Cu-3d type typical of delafossite oxides. The flat band potential V{sub fb} (+0.17V{sub sce}) lies below the H{sub 2}O/H{sub 2} potential permitting a spontaneous H{sub 2}-formation under band gap illumination in aqueous S{sup 2-} or SO{sub 3}{sup 2-} electrolytes. p-CuYO{sub 2} loaded with n-Cu{sub 2}O exhibited a higher performance with a H{sub 2} evolution rate of 0.4cm{sup 3}h{sup -1} in 0.1MS{sup 2-} (pH 13.4). The decrease of photoactivity over time is due to the formation of yellow polysulfides S{sub n}{sup 2-} which compete with H{sub 2}O in the reduction process. (author)

  11. Robust p-type doping of copper oxide using nitrogen implantation

    Science.gov (United States)

    Jorge, Marina; Polyakov, Stanislav M.; Cooil, Simon; Schenk, Alex K.; Edmonds, Mark; Thomsen, Lars; Mazzola, Federico; Wells, Justin W.

    2017-07-01

    We demonstrate robust p-type doping of Cu2O using low/medium energy ion implantation. Samples are made by controlled oxidation of annealed Cu metal foils, which results in Cu2O with levels of doping close to intrinsic. Samples are then implanted with nitrogen ions using a kinetic energy in the few keV range. Using this method, we are able to produce very high levels of doping, as evidenced by a 350 meV shift in the Fermi level towards the VB maximum. The robustness of the nitrogen implanted samples are tested by exposing them to atmospheric contaminants, and elevated temperatures. The samples are found to survive an increase in temperature of many hundreds of degrees. The robustness of the samples, combined with the fact that the materials used are safe, abundant and non-toxic and that the methods used for the growth of Cu2O and N+ implantation are simple and cheap to implement industrially, underlines the potential of Cu2O:N for affordable intermediate band photovoltaics.

  12. Plasmodium P-Type Cyclin CYC3 Modulates Endomitotic Growth during Oocyst Development in Mosquitoes.

    Science.gov (United States)

    Roques, Magali; Wall, Richard J; Douglass, Alexander P; Ramaprasad, Abhinay; Ferguson, David J P; Kaindama, Mbinda L; Brusini, Lorenzo; Joshi, Nimitray; Rchiad, Zineb; Brady, Declan; Guttery, David S; Wheatley, Sally P; Yamano, Hiroyuki; Holder, Anthony A; Pain, Arnab; Wickstead, Bill; Tewari, Rita

    2015-11-01

    Cell-cycle progression and cell division in eukaryotes are governed in part by the cyclin family and their regulation of cyclin-dependent kinases (CDKs). Cyclins are very well characterised in model systems such as yeast and human cells, but surprisingly little is known about their number and role in Plasmodium, the unicellular protozoan parasite that causes malaria. Malaria parasite cell division and proliferation differs from that of many eukaryotes. During its life cycle it undergoes two types of mitosis: endomitosis in asexual stages and an extremely rapid mitotic process during male gametogenesis. Both schizogony (producing merozoites) in host liver and red blood cells, and sporogony (producing sporozoites) in the mosquito vector, are endomitotic with repeated nuclear replication, without chromosome condensation, before cell division. The role of specific cyclins during Plasmodium cell proliferation was unknown. We show here that the Plasmodium genome contains only three cyclin genes, representing an unusual repertoire of cyclin classes. Expression and reverse genetic analyses of the single Plant (P)-type cyclin, CYC3, in the rodent malaria parasite, Plasmodium berghei, revealed a cytoplasmic and nuclear location of the GFP-tagged protein throughout the lifecycle. Deletion of cyc3 resulted in defects in size, number and growth of oocysts, with abnormalities in budding and sporozoite formation. Furthermore, global transcript analysis of the cyc3-deleted and wild type parasites at gametocyte and ookinete stages identified differentially expressed genes required for signalling, invasion and oocyst development. Collectively these data suggest that cyc3 modulates oocyst endomitotic development in Plasmodium berghei.

  13. Design of P-Type Cladding Layers for Tunnel-Injected UVA Light Emitting Diodes

    CERN Document Server

    Zhang, Yuewei; Akyol, Fatih; Allerman, Andrew A; Moseley, Michael W; Armstrong, Andrew M; Rajan, Siddharth

    2016-01-01

    We discuss the engineering of p-AlGaN cladding layers for achieving efficient tunnel-injected III-Nitride ultraviolet light emitting diodes (UV LEDs) in the UV-A spectral range. We show that capacitance-voltage measurements can be used to estimate the compensation and doping in p-AlGaN layers located between the multi-quantum well region and the tunnel junction layer. By increasing the p-type doping concentration to overcome the background compensation, on-wafer external quantum efficiency and wall-plug efficiency of 3.37% and 1.62% were achieved for tunnel-injected UV LEDs emitting at 325 nm. We also show that interband tunneling hole injection can be used to realize UV LEDs without any acceptor doping. The work discussed here provides new understanding of hole doping and transport in AlGaN-based UV LEDs, and demonstrates the excellent performance of tunnel-injected LEDs for the UV-A wavelength range.

  14. P-type Planet–Planet Scattering: Kepler Close Binary Configurations

    Science.gov (United States)

    Gong, Yan-Xiang

    2017-01-01

    A hydrodynamical simulation shows that a circumbinary planet will migrate inward to the edge of the disk cavity. If multiple planets form in a circumbinary disk, successive migration will lead to planet–planet scattering (PPS). PPS of Kepler-like circumbinary planets is discussed in this paper. The aim of this paper is to answer how PPS affects the formation of these planets. We find that a close binary has a significant influence on the scattering process. If PPS occurs near the unstable boundary of a binary, about 10% of the systems can be completely destroyed after PPS. In more than 90% of the systems, there is only one planet left. Unlike the eccentricity distribution produced by PPS in a single star system, the surviving planets generally have low eccentricities if PPS take place near the location of the currently found circumbinary planets. In addition, the ejected planets are generally the innermost of two initial planets. The above results depend on the initial positions of the two planets. If the initial positions of the planets are moved away from the binary, the evolution tends toward statistics similar to those around single stars. In this process, the competition between the planet–planet force and the planet-binary force makes the eccentricity distribution of surviving planets diverse. These new features of P-type PPS will deepen our understanding of the formation of these circumbinary planets.

  15. Plasmodium P-Type Cyclin CYC3 Modulates Endomitotic Growth during Oocyst Development in Mosquitoes

    KAUST Repository

    Roques, Magali

    2015-11-13

    Cell-cycle progression and cell division in eukaryotes are governed in part by the cyclin family and their regulation of cyclin-dependent kinases (CDKs). Cyclins are very well characterised in model systems such as yeast and human cells, but surprisingly little is known about their number and role in Plasmodium, the unicellular protozoan parasite that causes malaria. Malaria parasite cell division and proliferation differs from that of many eukaryotes. During its life cycle it undergoes two types of mitosis: endomitosis in asexual stages and an extremely rapid mitotic process during male gametogenesis. Both schizogony (producing merozoites) in host liver and red blood cells, and sporogony (producing sporozoites) in the mosquito vector, are endomitotic with repeated nuclear replication, without chromosome condensation, before cell division. The role of specific cyclins during Plasmodium cell proliferation was unknown. We show here that the Plasmodium genome contains only three cyclin genes, representing an unusual repertoire of cyclin classes. Expression and reverse genetic analyses of the single Plant (P)-type cyclin, CYC3, in the rodent malaria parasite, Plasmodium berghei, revealed a cytoplasmic and nuclear location of the GFP-tagged protein throughout the lifecycle. Deletion of cyc3 resulted in defects in size, number and growth of oocysts, with abnormalities in budding and sporozoite formation. Furthermore, global transcript analysis of the cyc3-deleted and wild type parasites at gametocyte and ookinete stages identified differentially expressed genes required for signalling, invasion and oocyst development. Collectively these data suggest that cyc3 modulates oocyst endomitotic development in Plasmodium berghei.

  16. p-Type hydrogen sensing with Al- and V-doped TiO2 nanostructures

    Science.gov (United States)

    Li, Zhaohui; Ding, Dongyan; Ning, Congqin

    2013-01-01

    Doping with other elements is one of the efficient ways to modify the physical and chemical properties of TiO2 nanomaterials. In the present work, anatase TiO2 nanofilms doped with Al and V elements were fabricated through anodic oxidation of Ti6Al4V alloy and further annealing treatment. Hydrogen sensing behavior of the crystallized Ti-Al-V-O nanofilms at various working temperatures was investigated through exposure to 1,000 ppm H2. Different from n-type hydrogen sensing characteristics of undoped TiO2 nanotubes, the Al- and V-doped nanofilms presented a p-type hydrogen sensing behavior by showing increased resistance upon exposure to the hydrogen-containing atmosphere. The Ti-Al-V-O nanofilm annealed at 450°C was mainly composed of anatase phase, which was sensitive to hydrogen-containing atmosphere only at elevated temperatures. Annealing of the Ti-Al-V-O nanofilm at 550°C could increase the content of anatase phase in the oxide nanofilm and thus resulted in a good sensitivity and resistance recovery at both room temperature and elevated temperatures. The TiO2 nanofilms doped with Al and V elements shows great potential for use as a robust semiconducting hydrogen sensor.

  17. P-type InGaAsP coolers for integrated optic devices

    Science.gov (United States)

    Vashaee, Daryoosh; LaBounty, Christopher J.; Fang, Xiaofeng; Zeng, Gehong; Abraham, Patrick; Bowers, John E.; Shakouri, Ali

    2001-05-01

    Single stage thin film coolers based on thermoelectric and thermionic cooling in p-type InGaAsP superlattice structures have been fabricated. Devices with different sizes and at various ambient temperatures have been characterized. Experimental results showed 0.5 degree centigrade cooling below the ambient temperature at 25C. This cooling over 1 4mu2m thick superlattice barrier corresponds to cooling power densities on the order of 200 W/cm2. The device cools by a factor of two better at higher temperatures (70C). This is due to the reduction of the superlattice thermal conductivity and the broadening of the electronic distribution function at higher temperatures. 150x150 micrometers 2 devices provide largest cooling at room temperature while the optimum device size shrinks as the temperature increases. Simulations results that take into account finite thermal resistance of the InP substrate, the effect of the contact resistance, heat generation in the wire-bonds and metallic pads on top of the device predict accurately the optimum cooling of these micro refrigerators. By eliminating the major parasitic sources of heating (Joule heating in the substrate, heat conduction through the side contact and reducing the contact resistance to 5x7-7 ohm-cm2) simulations show that, ultimately, one can achieve 15 degree(s)C cooling (10's of kW/cm2 cooling power) with single stage p-InGaAsP thin film coolers.

  18. Structural change and power factor enhancement of thermoelectric p-type films

    Energy Technology Data Exchange (ETDEWEB)

    Rothe, Katrin; Leipner, Hartmut; Heyroth, Frank [Interdisziplinaeres Zentrum fuer Materialwissenschaften, Martin-Luther-Universitaet 06099 Halle (Germany); Stordeur, Matthias; Engers, Bernd [angaris GmbH, Heinrich-Damerow-Str. 1, 06120 Halle (Germany)

    2008-07-01

    By sputter-deposition thin films of the thermoelectric effective p-type compound semiconductor (Bi{sub 0.15}Sb{sub 0.85}){sub 2}Te{sub 3} were prepared. For the first time a distinct increase of the electrical conductivity s was observed after heating of the as-deposited films and afterwards cooling. For the enlightenment of this typical behavior, which seems to be similar found for phase change materials consisting of (Ge, Sb, Te)-alloys, also the Seebeck (S) and the Hall coefficient were measured. It was established that the increase of the electrical conductivity is not connected with an expected decrease of the Seebeck coefficient, because the charge carrier density is reduced but at the same time the hole mobility is increasing. Corresponding analytical investigations by XRD, EDX, and REM shows that besides a grain growth in the polycrystalline films a Te-rich phase appears after the heat treatment. The increase of the electrical conductivity at nearly unchanged Seebeck coefficient can be exploited for the enhancement of the film power factor (S{sup 2}s). This is important for the efficiency of thermoelectric thin films devices as miniaturized coolers, generators, and sensors. Nevertheless for a quantitative interpretation of the presented new experimental results further investigations and theoretical considerations are required.

  19. Ferromagnetic ordering of Cr and Fe doped p-type diamond: An ab initio study

    Energy Technology Data Exchange (ETDEWEB)

    Benecha, E. M. [Department of Physics, University of South Africa, P.O Box 392, UNISA 0003, Pretoria (South Africa); Lombardi, E. B. [College of Graduate Studies, University of South Africa, P.O Box 392, UNISA 0003, Pretoria (South Africa)

    2014-02-21

    Ferromagnetic ordering of transition metal dopants in semiconductors holds the prospect of combining the capabilities of semiconductors and magnetic systems in single hybrid devices for spintronic applications. Various semiconductors have so far been considered for spintronic applications, but low Curie temperatures have hindered room temperature applications. We report ab initio DFT calculations on the stability and magnetic properties of Fe and Cr impurities in diamond, and show that their ground state magnetic ordering and stabilization energies depend strongly on the charge state and type of co-doping. We predict that divacancy Cr{sup +2} and substitutional Fe{sup +1} order ferromagnetically in p-type diamond, with magnetic stabilization energies (and magnetic moment per impurity ion) of 16.9 meV (2.5 μ{sub B}) and 33.3 meV (1.0 μ{sub B}), respectively. These magnetic stabilization energies are much larger than what has been achieved in other semiconductors at comparable impurity concentrations, including the archetypal dilute magnetic semiconductor GaAs:Mn. In addition, substitutional Fe{sup +1} exhibits a strong half-metallic character, with the Fermi level crossing bands in only the spin down channel. These results, combined with diamond’s extreme properties, demonstrate that Cr or Fe dopedp-type diamond may successfully be considered in the search for room temperature spintronic materials.

  20. High-throughput search of ternary chalcogenides for p-type transparent electrodes

    Science.gov (United States)

    Shi, Jingming; Cerqueira, Tiago F. T.; Cui, Wenwen; Nogueira, Fernando; Botti, Silvana; Marques, Miguel A. L.

    2017-01-01

    Delafossite crystals are fascinating ternary oxides that have demonstrated transparent conductivity and ambipolar doping. Here we use a high-throughput approach based on density functional theory to find delafossite and related layered phases of composition ABX2, where A and B are elements of the periodic table, and X is a chalcogen (O, S, Se, and Te). From the 15 624 compounds studied in the trigonal delafossite prototype structure, 285 are within 50 meV/atom from the convex hull of stability. These compounds are further investigated using global structural prediction methods to obtain their lowest-energy crystal structure. We find 79 systems not present in the materials project database that are thermodynamically stable and crystallize in the delafossite or in closely related structures. These novel phases are then characterized by calculating their band gaps and hole effective masses. This characterization unveils a large diversity of properties, ranging from normal metals, magnetic metals, and some candidate compounds for p-type transparent electrodes. PMID:28266587

  1. Enhanced thermoelectric figure of merit of p-type half-Heuslers.

    Science.gov (United States)

    Yan, Xiao; Joshi, Giri; Liu, Weishu; Lan, Yucheng; Wang, Hui; Lee, Sangyeop; Simonson, J W; Poon, S J; Tritt, T M; Chen, Gang; Ren, Z F

    2011-02-01

    Half-Heuslers would be important thermoelectric materials due to their high temperature stability and abundance if their dimensionless thermoelectric figure of merit (ZT) could be made high enough. The highest peak ZT of a p-type half-Heusler has been so far reported about 0.5 due to the high thermal conductivity. Through a nanocomposite approach using ball milling and hot pressing, we have achieved a peak ZT of 0.8 at 700 °C, which is about 60% higher than the best reported 0.5 and might be good enough for consideration for waste heat recovery in car exhaust systems. The improvement comes from a simultaneous increase in Seebeck coefficient and a significant decrease in thermal conductivity due to nanostructures. The samples were made by first forming alloyed ingots using arc melting and then creating nanopowders by ball milling the ingots and finally obtaining dense bulk by hot pressing. Further improvement in ZT is expected when average grain sizes are made smaller than 100 nm.

  2. Interstitial oxygen as a source of p-type conductivity in hexagonal manganites

    Science.gov (United States)

    Skjærvø, Sandra H.; Wefring, Espen T.; Nesdal, Silje K.; Gaukås, Nikolai H.; Olsen, Gerhard H.; Glaum, Julia; Tybell, Thomas; Selbach, Sverre M.

    2016-12-01

    Hexagonal manganites, h-RMnO3 (R=Sc, Y, Ho-Lu), have been intensively studied for their multiferroic properties, magnetoelectric coupling, topological defects and electrically conducting domain walls. Although point defects strongly affect the conductivity of transition metal oxides, the defect chemistry of h-RMnO3 has received little attention. We use a combination of experiments and first principles electronic structure calculations to elucidate the effect of interstitial oxygen anions, Oi, on the electrical and structural properties of h-YMnO3. Enthalpy stabilized interstitial oxygen anions are shown to be the main source of p-type electronic conductivity, without reducing the spontaneous ferroelectric polarization. A low energy barrier interstitialcy mechanism is inferred from Density Functional Theory calculations to be the microscopic migration path of Oi. Since the Oi content governs the concentration of charge carrier holes, controlling the thermal and atmospheric history provides a simple and fully reversible way of tuning the electrical properties of h-RMnO3.

  3. High-Performance p-Type Black Phosphorus Transistor with Scandium Contact.

    Science.gov (United States)

    Li, Ling; Engel, Michael; Farmer, Damon B; Han, Shu-Jen; Wong, H-S Philip

    2016-04-26

    A record high current density of 580 μA/μm is achieved for long-channel, few-layer black phosphorus transistors with scandium contacts after 400 K vacuum annealing. The annealing effectively improves the on-state current and Ion/Ioff ratio by 1 order of magnitude and the subthreshold swing by ∼2.5×, whereas Al2O3 capping significantly degrades transistor performances, resulting in 5× lower on-state current and 3× lower Ion/Ioff ratio. The influences of moisture on black phosphorus metal contacts are elucidated by analyzing the hysteresis of 3-20 nm thick black phosphorus transistors with scandium and gold contacts under different conditions: as-fabricated, after vacuum annealing, and after Al2O3 capping. The optimal black phosphorus film thickness for transistors with scandium contacts is found to be ∼10 nm. Moreover, p-type performance is shown in all transistors with scandium contacts, suggesting that the Fermi level is pinned closer to the valence band regardless of the flake thickness.

  4. High-throughput search of ternary chalcogenides for p-type transparent electrodes

    Science.gov (United States)

    Shi, Jingming; Cerqueira, Tiago F. T.; Cui, Wenwen; Nogueira, Fernando; Botti, Silvana; Marques, Miguel A. L.

    2017-03-01

    Delafossite crystals are fascinating ternary oxides that have demonstrated transparent conductivity and ambipolar doping. Here we use a high-throughput approach based on density functional theory to find delafossite and related layered phases of composition ABX2, where A and B are elements of the periodic table, and X is a chalcogen (O, S, Se, and Te). From the 15 624 compounds studied in the trigonal delafossite prototype structure, 285 are within 50 meV/atom from the convex hull of stability. These compounds are further investigated using global structural prediction methods to obtain their lowest-energy crystal structure. We find 79 systems not present in the materials project database that are thermodynamically stable and crystallize in the delafossite or in closely related structures. These novel phases are then characterized by calculating their band gaps and hole effective masses. This characterization unveils a large diversity of properties, ranging from normal metals, magnetic metals, and some candidate compounds for p-type transparent electrodes.

  5. Growth of antimony doped P-type zinc oxide nanowires for optoelectronics

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Zhong Lin; Pradel, Ken

    2016-09-27

    In a method of growing p-type nanowires, a nanowire growth solution of zinc nitrate (Zn(NO.sub.3).sub.2), hexamethylenetetramine (HMTA) and polyethylenemine (800 M.sub.w PEI) is prepared. A dopant solution to the growth solution, the dopant solution including an equal molar ration of sodium hydroxide (NaOH), glycolic acid (C.sub.2H.sub.4O.sub.3) and antimony acetate (Sb(CH.sub.3COO).sub.3) in water is prepared. The dopant solution and the growth solution combine to generate a resulting solution that includes antimony to zinc in a ratio of between 0.2% molar to 2.0% molar, the resulting solution having a top surface. An ammonia solution is added to the resulting solution. A ZnO seed layer is applied to a substrate and the substrate is placed into the top surface of the resulting solution with the ZnO seed layer facing downwardly for a predetermined time until Sb-doped ZnO nanowires having a length of at least 5 .mu.m have grown from the ZnO seed layer.

  6. Recombination of charge carriers on radiation-induced defects in silicon doped by transition metals impurities

    CERN Document Server

    Kazakevich, L A

    2003-01-01

    It has been studied the peculiarities of recombination of nonequilibrium charge carriers on radiation-induced defects in received according to Czochralski method p-silicon (p approx 3 - 20 Ohm centre dot cm), doped by one of the impurities of transition metals of the IV-th group of periodic table (titanium, zirconium, hafnium). Experimental results are obtained out of the analysis of temperature and injection dependence of the life time of charge carriers. The results are explained taking into consideration the influences of elastic stress fields created by the aggregates of transition metals atoms on space distribution over the crystal of oxygen and carbon background impurities as well as on the migration of movable radiation-induced defects during irradiation. (authors).

  7. Low cost monocrystalline silicon sheet fabrication for solar cells by advanced ingot technology

    Science.gov (United States)

    Fiegl, G. F.; Bonora, A. C.

    1980-01-01

    The continuous liquid feed (CLF) Czochralski furnace and the enhanced I.D. slicing technology for the low-cost production of monocrystalline silicon sheets for solar cells are discussed. The incorporation of the CLF system is shown to improve ingot production rate significantly. As demonstrated in actual runs, higher than average solidification rates (75 to 100 mm/hr for 150 mm 1-0-0 crystals) can be achieved, when the system approaches steady-state conditions. The design characteristics of the CLF furnace are detailed, noting that it is capable of precise control of dopant impurity incorporation in the axial direction of the crystal. The crystal add-on cost is computed to be $11.88/sq m, considering a projected 1986 25-slice per cm conversion factor with an 86% crystal growth yield.

  8. Ground-state splitting of ultrashallow thermal donors with negative central-cell corrections in silicon

    Science.gov (United States)

    Hara, Akito; Awano, Teruyoshi

    2017-06-01

    Ultrashallow thermal donors (USTDs), which consist of light element impurities such as carbon, hydrogen, and oxygen, have been found in Czochralski silicon (CZ Si) crystals. To the best of our knowledge, these are the shallowest hydrogen-like donors with negative central-cell corrections in Si. We observed the ground-state splitting of USTDs by far-infrared optical absorption at different temperatures. The upper ground-state levels are approximately 4 meV higher than the ground-state levels. This energy level splitting is also consistent with that obtained by thermal excitation from the ground state to the upper ground state. This is direct evidence that the wave function of the USTD ground state is made up of a linear combination of conduction band minimums.

  9. Low cost monocrystalline silicon sheet fabrication for solar cells by advanced ingot technology

    Science.gov (United States)

    Fiegl, G. F.; Bonora, A. C.

    1980-01-01

    The continuous liquid feed (CLF) Czochralski furnace and the enhanced I.D. slicing technology for the low-cost production of monocrystalline silicon sheets for solar cells are discussed. The incorporation of the CLF system is shown to improve ingot production rate significantly. As demonstrated in actual runs, higher than average solidification rates (75 to 100 mm/hr for 150 mm 1-0-0 crystals) can be achieved, when the system approaches steady-state conditions. The design characteristics of the CLF furnace are detailed, noting that it is capable of precise control of dopant impurity incorporation in the axial direction of the crystal. The crystal add-on cost is computed to be $11.88/sq m, considering a projected 1986 25-slice per cm conversion factor with an 86% crystal growth yield.

  10. G-centers in irradiated silicon revisited: A screened hybrid density functional theory approach

    Energy Technology Data Exchange (ETDEWEB)

    Wang, H.; Schwingenschlögl, U., E-mail: Udo.Schwingenschlogl@kaust.edu.sa [PSE Division, KAUST, Thuwal 23955-6900 (Saudi Arabia); Chroneos, A., E-mail: Alex.Chroneos@open.ac.uk [Engineering and Innovation, The Open University, Milton Keynes MK7 6AA (United Kingdom); Department of Materials, Imperial College, London SW7 2AZ (United Kingdom); Londos, C. A.; Sgourou, E. N. [University of Athens, Solid State Physics Section, Panepistimiopolis Zografos, Athens 157 84 (Greece)

    2014-05-14

    Electronic structure calculations employing screened hybrid density functional theory are used to gain fundamental insight into the interaction of carbon interstitial (C{sub i}) and substitutional (C{sub s}) atoms forming the C{sub i}C{sub s} defect known as G-center in silicon (Si). The G-center is one of the most important radiation related defects in Czochralski grown Si. We systematically investigate the density of states and formation energy for different types of C{sub i}C{sub s} defects with respect to the Fermi energy for all possible charge states. Prevalence of the neutral state for the C-type defect is established.

  11. Realization of Cu-Doped p-Type ZnO Thin Films by Molecular Beam Epitaxy.

    Science.gov (United States)

    Suja, Mohammad; Bashar, Sunayna B; Morshed, Muhammad M; Liu, Jianlin

    2015-04-29

    Cu-doped p-type ZnO films are grown on c-sapphire substrates by plasma-assisted molecular beam epitaxy. Photoluminescence (PL) experiments reveal a shallow acceptor state at 0.15 eV above the valence band edge. Hall effect results indicate that a growth condition window is found for the formation of p-type ZnO thin films, and the best conductivity is achieved with a high hole concentration of 1.54 × 10(18) cm(-3), a low resistivity of 0.6 Ω cm, and a moderate mobility of 6.65 cm(2) V(-1) s(-1) at room temperature. Metal oxide semiconductor capacitor devices have been fabricated on the Cu-doped ZnO films, and the characteristics of capacitance-voltage measurements demonstrate that the Cu-doped ZnO thin films under proper growth conditions are p-type. Seebeck measurements on these Cu-doped ZnO samples lead to positive Seebeck coefficients and further confirm the p-type conductivity. Other measurements such as X-ray diffraction, X-ray photoelectron, Raman, and absorption spectroscopies are also performed to elucidate the structural and optical characteristics of the Cu-doped p-type ZnO films. The p-type conductivity is explained to originate from Cu substitution of Zn with a valency of +1 state. However, all p-type samples are converted to n-type over time, which is mostly due to the carrier compensation from extrinsic defects of ZnO.

  12. P-type thin films transistors with solution-deposited lead sulfide films as semiconductor

    Energy Technology Data Exchange (ETDEWEB)

    Carrillo-Castillo, A.; Salas-Villasenor, A.; Mejia, I. [Department of Materials Science and Engineering, The University of Texas at Dallas. 800 West Campbell Rd, Richardson, TX 75083 (United States); Aguirre-Tostado, S. [Centro de Investigacion en Materiales Avanzados, S. C. Alianza Norte 202, Parque de Investigacion e Innovacion Tecnologica, Apodaca, Nuevo Leon, C.P. 666000 (Mexico); Gnade, B.E. [Department of Materials Science and Engineering, University of Texas at Dallas. 800 West Campbell Rd, Richardson, TX 75083 (United States); Quevedo-Lopez, M.A., E-mail: mxq071000@utdallas.edu [Department of Materials Science and Engineering, University of Texas at Dallas. 800 West Campbell Rd, Richardson, TX 75083 (United States)

    2012-01-31

    In this paper we demonstrate p-type thin film transistors fabricated with lead sulfide (PbS) as semiconductor deposited by chemical bath deposition methods. Crystallinity and morphology of the resulting PbS films were characterized using X-ray diffraction, atomic force microscopy and scanning electron microscopy. Devices were fabricated using photolithographic processes in a bottom gate configuration with Au as source and drain top contacts. Field effect mobility for as-fabricated devices was {approx} 0.09 cm{sup 2} V{sup -1} s{sup -1} whereas the mobility for devices annealed at 150 Degree-Sign C/h in forming gas increased up to {approx} 0.14 cm{sup 2} V{sup -1} s{sup -1}. Besides the thermal annealing, the entire fabrications process was maintained below 100 Degree-Sign C. The electrical performance of the PbS-thin film transistors was studied before and after the 150 Degree-Sign C anneal as well as a function of the PbS active layer thicknesses. - Highlights: Black-Right-Pointing-Pointer Thin film transistors with PbS as semiconductor deposited by chemical bath deposition. Black-Right-Pointing-Pointer Photolithography-based thin film transistors with PbS films at low temperatures. Black-Right-Pointing-Pointer Electron mobility for anneal-PbS devices of {approx} 0.14 cm{sup 2} V{sup -1} s{sup -1}. Black-Right-Pointing-Pointer Highest mobility reported in thin film transistors with PbS as the semiconductor.

  13. Plasmodium P-Type Cyclin CYC3 Modulates Endomitotic Growth during Oocyst Development in Mosquitoes.

    Directory of Open Access Journals (Sweden)

    Magali Roques

    2015-11-01

    Full Text Available Cell-cycle progression and cell division in eukaryotes are governed in part by the cyclin family and their regulation of cyclin-dependent kinases (CDKs. Cyclins are very well characterised in model systems such as yeast and human cells, but surprisingly little is known about their number and role in Plasmodium, the unicellular protozoan parasite that causes malaria. Malaria parasite cell division and proliferation differs from that of many eukaryotes. During its life cycle it undergoes two types of mitosis: endomitosis in asexual stages and an extremely rapid mitotic process during male gametogenesis. Both schizogony (producing merozoites in host liver and red blood cells, and sporogony (producing sporozoites in the mosquito vector, are endomitotic with repeated nuclear replication, without chromosome condensation, before cell division. The role of specific cyclins during Plasmodium cell proliferation was unknown. We show here that the Plasmodium genome contains only three cyclin genes, representing an unusual repertoire of cyclin classes. Expression and reverse genetic analyses of the single Plant (P-type cyclin, CYC3, in the rodent malaria parasite, Plasmodium berghei, revealed a cytoplasmic and nuclear location of the GFP-tagged protein throughout the lifecycle. Deletion of cyc3 resulted in defects in size, number and growth of oocysts, with abnormalities in budding and sporozoite formation. Furthermore, global transcript analysis of the cyc3-deleted and wild type parasites at gametocyte and ookinete stages identified differentially expressed genes required for signalling, invasion and oocyst development. Collectively these data suggest that cyc3 modulates oocyst endomitotic development in Plasmodium berghei.

  14. Electron spin relaxation in p-type GaAs quantum wells

    Science.gov (United States)

    Zhou, Y.; Jiang, J. H.; Wu, M. W.

    2009-11-01

    We investigate electron spin relaxation in p-type GaAs quantum wells from a fully microscopic kinetic spin Bloch equation approach, with all the relevant scatterings, such as electron-impurity, electron-phonon, electron-electron Coulomb, electron-hole Coulomb and electron-hole exchange (the Bir-Aronov-Pikus (BAP) mechanism) scatterings, explicitly included. Via this approach, we examine the relative importance of the D'yakonov-Perel' (DP) and BAP mechanisms in wide ranges of temperature, hole density, excitation density and impurity density, and present a phase-diagram-like picture showing the parameter regime where the DP or BAP mechanism is more important. It is discovered that in the impurity-free case the temperature regime where the BAP mechanism is more efficient than the DP one is around the hole Fermi temperature for high hole density, regardless of excitation density. However, in the high impurity density case with the impurity density identical to the hole density, this regime is roughly from the electron Fermi temperature to the hole Fermi temperature. Moreover, we predict that for the impurity-free case, in the regime where the DP mechanism dominates the spin relaxation at all temperatures, the temperature dependence of the spin relaxation time (SRT) presents a peak around the hole Fermi temperature, which originates from the electron-hole Coulomb scattering. We also predict that at low temperature, the hole-density dependence of the electron SRT exhibits a double-peak structure in the impurity-free case, whereas it shows first a peak and then a valley in the case of identical impurity and hole densities. These intriguing behaviors are due to the contribution from holes in high subbands.

  15. Characterization of YbNi4(P1-xAsx)2, x = 0, 0.2 single crystals grown by Czochralski method

    Science.gov (United States)

    Kliemt, K.; Krellner, C.

    2017-04-01

    We have investigated large single crystals of YbNi4P2 that were grown from a levitating melt by the Czochralski method. The new samples facilitate the determination of the absolute values of the electrical resistivity. Phase pure polycrystalline samples of the non-magnetic reference LuNi4P2 were prepared and the electrical resistivity was measured. Furthermore we have grown a single crystal of the As substituted compound YbNi4(P1-xAsx)2, x = 0.2 and investigated the homogenity of the As distribution.

  16. Increased luminescence and improved decay kinetics in lithium and cerium co-doped yttrium aluminum garnet scintillators grown by the Czochralski method

    Science.gov (United States)

    Dickens, Peter T.; Haven, Drew T.; Friedrich, Stephan; Saleh, Muad; Lynn, Kelvin G.

    2017-03-01

    In this study, four yttrium aluminum garnet single crystals co-doped with cerium and lithium were produced by the Czochralski method and the scintillation and defect properties were investigated. Our results demonstrated an increase in luminescence with Li co-doping as well as elimination of longer decay times. Surprisingly, although Li is monovalent, no oxidation of cerium from Ce3+ to Ce4+ was found as would be expected to maintain charge neutrality. Additionally, thermoluminescence results indicated a reduction in the trapping of charge carriers by shallow and deep traps, and room temperature photoluminescence measurements showed an improvement in the Ce3+ 5d to 4f transition efficiency.

  17. Inorganic p-Type Semiconductors: Their Applications and Progress in Dye-Sensitized Solar Cells and Perovskite Solar Cells

    Directory of Open Access Journals (Sweden)

    Ming-Hsien Li

    2016-04-01

    Full Text Available Considering the increasing global demand for energy and the harmful ecological impact of conventional energy sources, it is obvious that development of clean and renewable energy is a necessity. Since the Sun is our only external energy source, harnessing its energy, which is clean, non-hazardous and infinite, satisfies the main objectives of all alternative energy strategies. With attractive features, i.e., good performance, low-cost potential, simple processibility, a wide range of applications from portable power generation to power-windows, photoelectrochemical solar cells like dye-sensitized solar cells (DSCs represent one of the promising methods for future large-scale power production directly from sunlight. While the sensitization of n-type semiconductors (n-SC has been intensively studied, the use of p-type semiconductor (p-SC, e.g., the sensitization of wide bandgap p-SC and hole transport materials with p-SC have also been attracting great attention. Recently, it has been proved that the p-type inorganic semiconductor as a charge selective material or a charge transport material in organometallic lead halide perovskite solar cells (PSCs shows a significant impact on solar cell performance. Therefore the study of p-type semiconductors is important to rationally design efficient DSCs and PSCs. In this review, recent published works on p-type DSCs and PSCs incorporated with an inorganic p-type semiconductor and our perspectives on this topic are discussed.

  18. Comparison of ferromagnetism in n- and p-type magnetic semiconductor thin films of ZnCoO

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Y.H., E-mail: yuhua@phys.ncku.edu.t [Department of Physics, National Cheng Kung University, No. 1, Ta-Shuei Road, Tainan 70101, Taiwan (China); Lee, J.C.; Min, J.F. [Department of Physics, National Cheng Kung University, No. 1, Ta-Shuei Road, Tainan 70101, Taiwan (China); Su, C.W. [Department of Applied Physics, National Chiayi University, Chiayi 60004, Taiwan (China)

    2011-07-15

    Both n- and p-type diluted magnetic semiconductor ZnCoO are made by magnetron co-sputtering with, respectively, dopants of Al and dual dopants of Al and N. The two sputtering targets are compound ZnCoO with 5% weight of Co and pure metal Al. Sputtering gases for n- and p-type films are pure Ar and N{sub 2}, respectively. These films are magnetic at room temperature and possess free electron- and hole-concentration of 5.34x10{sup 20} and 5.27x10{sup 13} cm{sup -3}. Only the n-type film exhibits anomalous Hall-effect signals. Magnetic properties of these two types of films are compared and discussed based on measurements of microstructure and magneto-transport properties. - Research highlights: n-type ZnCoO:Al and p-type ZnCoO:(Al, N) films are made and are both ferromagnetic at room temperature. Signal of anomalous Hall-effect (AHE) is clearly observed only for n-type film but not for p-type film. Photoluminescence (PL) spectrum shows a peak attributed to shallow acceptor band of N. Ferromagnetic exchange coupling between magnetic ions in n-type film is through spin polarized free electrons. Ferromagnetism in p-type film is not attributed to the free hole-carriers mediation but to the overlap of BMP.

  19. Photoelectrochemical hydrogen-evolution over p-type chalcopyrite CuInSe{sub 2}

    Energy Technology Data Exchange (ETDEWEB)

    Djellal, L. [Laboratoire des Solutions Solides, Faculte de Physique, (USTHB) BP 32 El Alia 16111, Algiers (Algeria); Omeiri, S.; Bouguelia, A. [Laboratoire de Stockage et de Valorisation des Energies Renouvelables, Faculte de Chimie, (USTHB) BP 32 El Alia 16111, Algiers (Algeria); Trari, M. [Laboratoire de Stockage et de Valorisation des Energies Renouvelables, Faculte de Chimie, (USTHB) BP 32 El Alia 16111, Algiers (Algeria)], E-mail: mtrari@caramail.com

    2009-05-12

    Photocatalytic H{sub 2}-production has been realized over active CuInSe{sub 2}, synthesized by the fusion technique. The material crystallizes in the chalcopyrite structure and exhibits p-type conductivity ascribed to copper deficiency. An optical gap of 0.95 eV was determined from the reflectance diffuse spectrum. The electrical conductivity follows an Arrhenius-type law with activation energy of 23 meV in conformity with polaron hopping. The slope and the intercept of the Mott-Schottky plot gave a holes density N{sub A} of 5.9 x 10{sup 18} cm{sup -3} and a flat band potential of -0.36V{sub SCE}, in perfect agreement with the photo-onset potential V{sub on} (-0.35V{sub SCE}). Hence, the conduction band, located at -1.29V{sub SCE}, allows a spontaneous H{sub 2} liberation upon visible light. In aqueous solutions, the material is stabilized by hole consumption involving X{sup 2-} species (=S{sup 2-} and SO{sub 3}{sup 2-}). H{sub 2} formation would become thermodynamically easy in alkaline media and the best photoactivity was obtained in thiosulfate electrolyte (10{sup -2} M S{sub 2}O{sub 3}{sup 2-}, 0.5 M KOH) with an evolution rate of 0.009 ml mg{sup -1} h{sup -1}. The light induced electron transfer through the interface involves two steps mechanism where S{sub 2}O{sub 3}{sup 2-} is oxidized to SO{sub 3}{sup 2-} and SO{sub 4}{sup 2-} by successive reactions. Such results are corroborated by the semi logarithmic plots and photocurrent-photopotential characteristics. The influence of pH was studied with S{sub 2}O{sub 3}{sup 2-} The tendency towards saturation for prolonged irradiation is attributed to competitive reductions of the end products S{sub n}{sup 2-} and S{sub 2}O{sub 6}{sup 2-} with water and to the yellow color of polysulfide S{sub n}{sup 2-}.

  20. Comparison of p-type commercial electron diodes for in vivo dosimetry.

    Science.gov (United States)

    Marre, D; Marinello, G

    2004-01-01

    This paper compares the characteristics of three types of commercial p-type electron diodes specially designed for in vivo dosimetry (Scanditronix EDD2, Sun Nuclear QED 111200-0 and PTW T60010E diodes coupled with a Therados DPD510 dosimeter) in electron fields with energies from 4.5 to 21 MeV, and in conditions similar to those encountered in radiotherapy. In addition to the diodes, a NACP plane parallel ionization chamber and film dosimeters have been used in the experiments. The influence of beam direction on the diode responses (directional effect) was investigated. It was found to be the greatest for the lowest electron beam energy. At 12 MeV and an incidence of +/- 30 degrees, the variation was found to be less than 1% for the Scanditronix and Sun Nuclear diodes and less than 3% for the PTW one. The three diodes exhibited a variation in sensitivity with dose-per-pulse of less than 1% over the range 0.18-0.43 mGy/pulse. The temperature dependence was also studied. The response was linear for the three diodes between 22.2 and 40 degrees C and the sensitivity variations with temperature were (0.25+/-0.01)%/degree C, (0.28+/-0.01)%/degree C, and (0.02 +/-0.01)%/degree C for Scanditronix, Sun Nuclear, and PTW diodes, respectively. Finally the perturbation to the irradiation field induced by the presence of diodes placed at the surface of a homogeneous phantom was investigated and found to be significant, both at the surface and at the depth of maximum dose (several tens of percent) for all three diode types. There is an increase of dose right underneath the diode (close to the surface) and a dose shadow at the depth of maximum. The study shows that electron diodes can be used for in vivo dosimetry provided their characteristics are carefully established before use and taken into consideration at the time of interpretation of the results.

  1. Lifetime and DLTS studies of interstitial Fe in p-type Si

    Energy Technology Data Exchange (ETDEWEB)

    Syre, M.; Holt, A. [Institute for Energy Technology (IFE), Solar Energy Department, P.O. Box 40, 2027 Kjeller (Norway); Monakov, E. [University of Oslo (UiO), Department of Physics, Blindern P.O. Box 1048, 0316 Oslo (Norway); Institute for Energy Technology (IFE), Solar Energy Department, P.O. Box 40, 2027 Kjeller (Norway); Svensson, B.G. [University of Oslo (UiO), Department of Physics, Blindern P.O. Box 1048, 0316 Oslo (Norway)

    2011-03-15

    Fe is one of the most prominent metallic impurities in solar-grade Si. In this work we have investigated the kinetics of in-diffusion and formation of the interstitial fraction (Fe{sub i}). P-type Cz-Si with a resistivity of 10 {omega}-cm has been intentionally contaminated with Fe by in-diffusion from a surface layer of FeCl{sub 3} at 700 C followed by cooling with a rate of {proportional_to} 3.3 K/s. The concentration of Fe{sub i} has been measured both by microwave photo conductance decay ({mu}-PCD) and deep level transient spectroscopy (DLTS). In the {mu}-PCD measurements, the Fe{sub i} concentration has been determined using the ef- fect of light-induced splitting of the iron-boron pairs (FeB), while in the DLTS measurements Fe{sub i} has been monitored by the donor electronic state at 0.43 eV above the valence band. We have observed a linear dependence between the minority carrier lifetime ({tau}) and the inverse Fe{sub i} concentration. This confirms Fe{sub i} as the dominating recombination centre. In the present investigations we use a material relevant for solar cells with a resistivity of 10 {omega}-cm. We have found that the concentration of interstitial iron decreases with increasing time for in-diffusion of Fe, provided identical cooling condition. This decreasing con- centration of Fe{sub i} is believed to be due to formation of more iron precipitates that serve as sinks for fast diffusing Fe{sub i}. A high temperature anneal at 1000 C for 1 minute followed by fast cooling ({proportional_to} 33 K/s) results in dissolution of the precipitates and freezing Fe into interstitial positions, where the concentration of Fe{sub i} increases with increasing in-diffusion time. (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  2. Silicon Sheet Growth Development for the Large Area Sheet Task of the Low Cost Solar Array Project. Heat Exchanger Method - Ingot Casting Fixed Abrasive Method - Multi-Wire Slicing

    Science.gov (United States)

    Schmid, F.; Khattak, C. P.

    1978-01-01

    Solar cells fabricated from HEM cast silicon yielded up to 15% conversion efficiencies. This was achieved in spite of using unpurified graphite parts in the HEM furnace and without optimization of material or cell processing parameters. Molybdenum retainers prevented SiC formation and reduced carbon content by 50%. The oxygen content of vacuum cast HEM silicon is lower than typical Czochralski grown silicon. Impregnation of 45 micrometers diamonds into 7.5 micrometers copper sheath showed distortion of the copper layer. However, 12.5 micrometers and 15 micrometers copper sheath can be impregnated with 45 micrometers diamonds to a high concentration. Electroless nickel plating of wires impregnated only in the cutting edge showed nickel concentration around the diamonds. This has the possibility of reducing kerf. The high speed slicer fabricated can achieve higher speed and longer stroke with vibration isolation.

  3. Continuous Czochralski growth: silicon sheet growth development of the large area silicon sheets task of the Low Cost Silicon Solar Array Project. Ninth quarterly progress report, October 1-December 31, 1979

    Energy Technology Data Exchange (ETDEWEB)

    Lane, R.L.; Roberts, E.

    1979-01-01

    During this reporting period, four more 100 kg continuous runs were completed to satisfy the six required by the project extension. One of the four (2*) was performed using a new standard CG2000 RC grower, using accessory equipment and process techniques developed under this project. The sixth and final 100 kg continuous run was performed with purified carbon parts and resulted in the best results to date. Run No. 62 resulted in 103.0 kg being pulled from 104.5 kg total charge weight (98.6% pulled yield). Of this 103 kg grown, 89.3 kg were monocrystalline. Moreover, 72.2 kg was OD material. Another encouraging result was that 85% of the eighth crystal was monocrystalline and 67% of the ninth and last crystal was monocrystaline after ninety seven hours of continuous growth. Impurity analysis data indicate that impurity build-up in grown crystals during 100 kg continuous runs is insignificant. However, the results indicate that impurities tend to accumulate in the crucible. Moreover, impurity analysis performed on new crucibles indicates that these new crucibles may not be as pure as the manufacturer's literature states. Solar cell efficiency data from two 100 kg continuous runs were received this quarter with very encouraging results. The average efficiencies of all cells tested was 16.35% AM1, which is considerably higher than our 14% AM1 goal. Moreover, the efficiencies remained at or near the same levels throughout the entire 100 kg continuous run. We expect to receive solar cell efficiency results from three more of the 100 kg continuous runs in the next quarter.

  4. Emitter formation using laser doping technique on n- and p-type c-Si substrates

    Science.gov (United States)

    López, G.; Ortega, P.; Colina, M.; Voz, C.; Martín, I.; Morales-Vilches, A.; Orpella, A.; Alcubilla, R.

    2015-05-01

    In this work laser doping technique is used to create highly-doped regions defined in a point-like structure to form n+/p and p+/n junctions applying a pulsed Nd-YAG 1064 nm laser in the nanosecond regime. In particular, phosphorous-doped silicon carbide stacks (a-SiCx/a-Si:H (n-type)) deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) and aluminum oxide (Al2O3) layers deposited by atomic layer deposition (ALD) on 2 ± 0.5 Ω cm p- and n-type FZ c-Si substrates respectively are used as dopant sources. Laser power and number of pulses per spot are explored to obtain the optimal electrical behavior of the formed junctions. To assess the quality of the p+ and n+ regions, the junctions are electrically contacted and characterized by means of dark J-V measurements. Additionally, a diluted HF treatment previous to front metallization has been explored in order to know its impact on the junction quality. The results show that fine tuning of the energy pulse is critical while the number of pulses has minor effect. In general the different HF treatments have no impact in the diode electrical behavior except for an increase of the leakage current in n+/p junctions. The high electrical quality of the junctions makes laser doping, using dielectric layers as dopant source, suitable for solar cell applications. Particularly, a potential open circuit voltage of 0.64 V (1 sun) is expected for a finished solar cell.

  5. Emitter formation using laser doping technique on n- and p-type c-Si substrates

    Energy Technology Data Exchange (ETDEWEB)

    López, G., E-mail: gema.lopez@upc.edu; Ortega, P.; Colina, M.; Voz, C.; Martín, I.; Morales-Vilches, A.; Orpella, A.; Alcubilla, R.

    2015-05-01

    Highlights: • We use laser doping technique to create highly-doped regions. • Dielectric layers are used as both passivating layer and dopant source. • The high quality of the junctions makes laser doping technique using dielectric layers as dopant source suitable for solar cells applications. - Abstract: In this work laser doping technique is used to create highly-doped regions defined in a point-like structure to form n+/p and p+/n junctions applying a pulsed Nd-YAG 1064 nm laser in the nanosecond regime. In particular, phosphorous-doped silicon carbide stacks (a-SiC{sub x}/a-Si:H (n-type)) deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) and aluminum oxide (Al{sub 2}O{sub 3}) layers deposited by atomic layer deposition (ALD) on 2 ± 0.5 Ω cm p- and n-type FZ c-Si substrates respectively are used as dopant sources. Laser power and number of pulses per spot are explored to obtain the optimal electrical behavior of the formed junctions. To assess the quality of the p+ and n+ regions, the junctions are electrically contacted and characterized by means of dark J–V measurements. Additionally, a diluted HF treatment previous to front metallization has been explored in order to know its impact on the junction quality. The results show that fine tuning of the energy pulse is critical while the number of pulses has minor effect. In general the different HF treatments have no impact in the diode electrical behavior except for an increase of the leakage current in n+/p junctions. The high electrical quality of the junctions makes laser doping, using dielectric layers as dopant source, suitable for solar cell applications. Particularly, a potential open circuit voltage of 0.64 V (1 sun) is expected for a finished solar cell.

  6. A CMOS silicon spin qubit

    Science.gov (United States)

    Maurand, R.; Jehl, X.; Kotekar-Patil, D.; Corna, A.; Bohuslavskyi, H.; Laviéville, R.; Hutin, L.; Barraud, S.; Vinet, M.; Sanquer, M.; de Franceschi, S.

    2016-11-01

    Silicon, the main constituent of microprocessor chips, is emerging as a promising material for the realization of future quantum processors. Leveraging its well-established complementary metal-oxide-semiconductor (CMOS) technology would be a clear asset to the development of scalable quantum computing architectures and to their co-integration with classical control hardware. Here we report a silicon quantum bit (qubit) device made with an industry-standard fabrication process. The device consists of a two-gate, p-type transistor with an undoped channel. At low temperature, the first gate defines a quantum dot encoding a hole spin qubit, the second one a quantum dot used for the qubit read-out. All electrical, two-axis control of the spin qubit is achieved by applying a phase-tunable microwave modulation to the first gate. The demonstrated qubit functionality in a basic transistor-like device constitutes a promising step towards the elaboration of scalable spin qubit geometries in a readily exploitable CMOS platform.

  7. Boric acid solution concentration influencing p-type emitter formation in n-type crystalline Si solar cells

    Science.gov (United States)

    Singha, Bandana; Singh Solanki, Chetan

    2016-09-01

    Boric acid (BA) is a spin on dopant (BSoD) source which is used to form p+ emitters in n-type c-Si solar cells. High purity boric acid powder (99.99% pure) when mixed with deionized (DI) water can result in high quality p-type emitter with less amount of surface defects. In this work, we have used different concentrations of boric acid solution concentrations to fabricate p-type emitters with sheet resistance values < 90 Ω/□. The corresponding junction depths for the same are less than 500 nm as measured by SIMS analysis. Boron rich layer (BRL), which is considered as detrimental in emitter performance is found to be minimal for BA solution concentration less than 2% and hence useful for p-type emitter formation.

  8. Modeling of normal incidence absorption in p-type GaAs/AlGaAs quantum well infrared detectors

    Science.gov (United States)

    Brown, Gail J.; Szmulowicz, Frank

    1995-04-01

    The absorption of infrared radiation at normal incidence in p-type GaAs/AlGaAs quantum wells, unlike in n-type, is fundamentally allowed. We have measured and theoretically modeled the bound-to-continuum absorption in these p-type materials. The infrared absorption coefficient was calculated are based on the electronic structure, wave functions and optical matrix elements obtained from an 8 X 8 envelope-function approximation (EFA) calculation. The 8 X 8 EFA Hamiltonian incorporates the coupling between the heavy, light, spin-orbit, and conduction bands. In calculating the continuum states for bound-to- continuum intersubband absorption, we do not enclose the well in an artificial box with infinite walls. A comparison of the theoretical absorption and measured photoresponse results verified the accuracy of our model and provided a basis for optimizing the design of p-type quantum wells for infrared detection.

  9. Fabrication of p-type ZnO nanofibers by electrospinning for field-effect and rectifying devices

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Shuai; Liu, Shu-Liang; Liu, Ling-Zhi; Liu, Yi-Chen [College of Physics, Qingdao University, Qingdao 266071 (China); Long, Yun-Ze, E-mail: yunze.long@163.com [College of Physics, Qingdao University, Qingdao 266071 (China); Key Laboratory of Photonics Materials and Technology in Universities of Shandong (Qingdao University), Qingdao 266071 (China); State Key Laboratory Cultivation Base of New Fiber Materials and Modern Textile, Qingdao University, Qingdao 266071 (China); Collaborative Innovation Center for Marine Biomass Fibers, Materials and Textiles of Shandong Province, Qingdao 266071 (China); Zhang, Hong-Di; Zhang, Jun-Cheng; Han, Wen-Peng [College of Physics, Qingdao University, Qingdao 266071 (China); Key Laboratory of Photonics Materials and Technology in Universities of Shandong (Qingdao University), Qingdao 266071 (China)

    2014-01-27

    Ce-doped p-type ZnO nanofibers were synthesized by electrospinning and followed calcinations. The surface morphology, elementary composition, and crystal structure of the nanofibers were investigated. The field effect curve confirms that the resultant Ce-doped ZnO nanofibers are p-type semiconductor. A p-n heterojunction device consisting of Ce-doped p-type ZnO nanofibers and n-type indium tin oxide (ITO) thin film was fabricated on a piece of quartz substrate. The current-voltage (I-V) characteristic of the p-n heterojunction device shows typical rectifying diode behavior. The turn-on voltage appears at about 7 V under the forward bias and the reverse current is impassable.

  10. Development of advanced Czochralski growth process to produce low-cost 150 kG silicon ingots from a single crucible for technology readiness

    Science.gov (United States)

    1981-01-01

    The modified CG2000 crystal grower construction, installation, and machine check out was completed. The process development check out proceeded with several dry runs and one growth run. Several machine calibrations and functional problems were discovered and corrected. Exhaust gas analysis system alternatives were evaluated and an integrated system approved and ordered. Several growth runs on a development CG2000 RC grower show that complete neck, crown, and body automated growth can be achieved with only one operator input.

  11. Development of advanced Czochralski growth process to produce low cost 150 kg silicon ingots from a single crucible for technology readiness. [crystal growth

    Science.gov (United States)

    Lane, R. L.

    1981-01-01

    Six growth runs used the Kayex-Hameo Automatic Games Logic (AGILE) computer based system for growth from larger melts in the Mod CG2000. The implementation of the melt pyrometer sensor allowed for dip temperature monitoring and usage by the operator/AGILE system. Use of AGILE during recharge operations was successfully evaluated. The tendency of crystals to lose cylindrical shape (spiraling) continued to be a problem. The hygrometer was added to the Furnace Gas Analysis System and used on several growth runs. The gas chromatograph, including the integrator, was also used for more accurate carbon monoxide concentration measurements. Efforts continued for completing the automation of the total Gas Analysis System. An economic analysis, based on revised achievable straight growth rate, is presented.

  12. Electron Mobility in n-type Compensated Czochralski Silicon Crystal%n型补偿直拉单晶硅的电子迁移率

    Institute of Scientific and Technical Information of China (English)

    易俊; 陈鹏; 马向阳; 杨德仁

    2015-01-01

    通过霍尔效应测量、二次离子质谱等手段研究了n型硼-磷补偿直拉单晶硅的电子迁移率与掺杂浓度的关系.通过比较迁移率的实验测量值和由Klaassen迁移率模型得到的计算值,发现Klaassen模型适用于掺杂浓度在1018 cm-3数量级的补偿单晶硅电子迁移率的计算,但对掺杂浓度在1017cm-3数量级的补偿单晶硅而言则明显高估了电子迁移率.分析认为这是由于该模型未充分考虑低掺杂浓度情形下自由载流子对电离杂质的屏蔽作用由于杂质补偿受到的削弱效应.根据实验结果,修正了Klaassen模型,使之在低掺杂浓度的情况下获得的电子迁移率计算值也与实验值吻合得相当好.

  13. In silico identification and characterization of the ion transport specificity for P-type ATPases in the Mycobacterium tuberculosis complex

    Directory of Open Access Journals (Sweden)

    Novoa-Aponte Lorena

    2012-10-01

    Full Text Available Abstract Background P-type ATPases hydrolyze ATP and release energy that is used in the transport of ions against electrochemical gradients across plasma membranes, making these proteins essential for cell viability. Currently, the distribution and function of these ion transporters in mycobacteria are poorly understood. Results In this study, probabilistic profiles were constructed based on hidden Markov models to identify and classify P-type ATPases in the Mycobacterium tuberculosis complex (MTBC according to the type of ion transported across the plasma membrane. Topology, hydrophobicity profiles and conserved motifs were analyzed to correlate amino acid sequences of P-type ATPases and ion transport specificity. Twelve candidate P-type ATPases annotated in the M. tuberculosis H37Rv proteome were identified in all members of the MTBC, and probabilistic profiles classified them into one of the following three groups: heavy metal cation transporters, alkaline and alkaline earth metal cation transporters, and the beta subunit of a prokaryotic potassium pump. Interestingly, counterparts of the non-catalytic beta subunits of Hydrogen/Potassium and Sodium/Potassium P-type ATPases were not found. Conclusions The high content of heavy metal transporters found in the MTBC suggests that they could play an important role in the ability of M. tuberculosis to survive inside macrophages, where tubercle bacilli face high levels of toxic metals. Finally, the results obtained in this work provide a starting point for experimental studies that may elucidate the ion specificity of the MTBC P-type ATPases and their role in mycobacterial infections.

  14. Diffusion of copper in porous silicon

    Energy Technology Data Exchange (ETDEWEB)

    Andsager, D.; Hetrick, J.M.; Hilliard, J.; Nayfeh, M.H. [Department of Physics, 1110 West Green Street, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)

    1995-05-01

    We present a study on the nature of diffusion of copper in {ital p}-type porous silicon. The diffusion of evaporated copper in porous silicon and deposition of metal ions in aqueous solution through the porous network was measured by monitoring the metal concentration depth profile as a function of time using Auger electron spectroscopy. We observed that increasing metal penetration from copper evaporated samples correlates with quenching of photoluminescence, in agreement with previous ion quenching results. We extracted a diffusion coefficient from Auger concentration depth profiles which was seven orders of magnitude lower than that expected for diffusion of copper in bulk crystalline Si at room temperature. Deposition of ionic species cannot be characterized as a simple diffusion process. The observed deposition rates were strongly dependent on the solution concentration.

  15. Simulation of Enhancement Mode GaN HEMTs with Threshold > 5 V using P-type Buffer

    CERN Document Server

    Bajaj, Sanyam; Krishnamoorthy, Sriram; Hung, Ting-Hsiang; Rajan, Siddharth

    2015-01-01

    A high threshold voltage enhancement-mode GaN HEMT with p-type doped buffer is discussed and simulated. Analytical expressions are derived to explain the role of buffer capacitance in designing and enhancing threshold voltage. Simulations of the proposed device with p-type buffer show threshold voltages above 5 V, and a positive shift in threshold voltage as the oxide capacitance is reduced, thus enabling threshold voltage tunability over an unprecedented range for GaN-based HEMTs. The electric field profiles, breakdown performance, on-resistance and delay tradeoffs in the proposed pGaN back HEMT device are also discussed.

  16. Proton Pumping and Slippage Dynamics of a Eukaryotic P-Type ATPase Studied at the Single-Molecule Level

    DEFF Research Database (Denmark)

    Veshaguri, Salome

    In all eukaryotes the plasma membrane potential and secondary transport systems are energized by P-type ATPases whose regulation however remains poorly understood. Here we monitored at the single-molecule level the activity of the prototypic proton pumping P-type ATPase Arabidopsis thaliana isoform......-intuitively increased the time spent pumping. Allosteric regulation by pH gradients affected the time spent pumping and the leakage probability but surprisingly not the intrinsic pumping rate. Interestingly, ATP dilution decreased the ATP hydrolysis rates in bulk while single molecule data revealed that intrinsic...

  17. Si-C linked organic monolayers on crystalline silicon surfaces as alternative gate insulators

    NARCIS (Netherlands)

    Faber, E.J.; Smet, de L.C.P.M.; Olthuis, W.; Zuilhof, H.; Sudhölter, E.J.R.; Bergveld, P.; Berg, van den A.

    2005-01-01

    Herein, the influence of silicon surface modification via SiCnH2n+1 (n=10,12,16,22) monolayer-based devices on p-type 100 and n-type 100 silicon is studied by forming MIS (metal-insulator-semiconductor) diodes using a mercury probe. From current density-voltage (J-V) and capacitance-voltage (C-V) me

  18. Si-C linked organic monolayers on crystalline silicon surfaces as alternative gate insulators

    NARCIS (Netherlands)

    Faber, E.J.; Smet, de L.C.P.M.; Olthuis, W.; Zuilhof, H.; Sudhölter, E.J.R.; Bergveld, P.; Berg, van den A.

    2005-01-01

    Herein, the influence of silicon surface modification via SiCnH2n+1 (n=10,12,16,22) monolayer-based devices on p-type 100 and n-type 100 silicon is studied by forming MIS (metal-insulator-semiconductor) diodes using a mercury probe. From current density-voltage (J-V) and capacitance-voltage (C-V)

  19. Effect of a transverse magnetic field on solidification morphology and microstructures of pure Sn and Sn-15 wt% Pb alloys grown by a Czochralski method

    Science.gov (United States)

    Shen, Zhe; Zhong, Yunbo; Wang, Huai; Ren, Weili; Lei, Zuosheng; Ren, Zhongming

    2015-12-01

    The pure Sn and Sn-15 wt% Pb alloys were grown by a Czochralski method under various magnetic flux densities in this paper. The influence of thermoelectric magnetic (TEM) flows and buoyancy flows on solidification morphology, macrosegregation and microstructures had been investigated experimentally, and the velocity magnitude of TEM flows and buoyancy flows had been studied by 3D numerical simulations. The experimental results indicate that the modification of solidification morphology and microstructures is attributed to the unidirectional Pb solutes transport caused by TEM flows. The 3D numerical simulations results show that the buoyancy flows dominate the flows in the melt under a weak transverse magnetic field (B≤0.43 T), and the unidirectional TEM flows at the vicinity of solid-liquid interface become the dominant flows in the melt with the increase of magnetic field. The interaction of TEM flows and buoyancy flows affecting solidification morphology and microstructures during directional solidification of alloys by the Czochralski method under various magnetic flux densities has been discussed and a corresponding simple evolution mechanism of dendritic growth has been proposed.

  20. Determination of intrinsic polarization for K{sub 2}ZnCl{sub 4} single crystal grown by Czochralski technique for ferroelectric applications

    Energy Technology Data Exchange (ETDEWEB)

    Kumar, Sonu [Crystal Lab, Department of Physics & Astrophysics, University of Delhi, Delhi-7 (India); Ray, Geeta [Crystal Lab, Department of Physics & Astrophysics, University of Delhi, Delhi-7 (India); Physics Department, Miranda House, University of Delhi, Delhi-7 (India); Sinha, Nidhi [Crystal Lab, Department of Physics & Astrophysics, University of Delhi, Delhi-7 (India); Department of Electronics, SGTB Khalsa College, University of Delhi, Delhi-7 (India); Kumar, Binay, E-mail: b3kumar69@yahoo.co.in [Crystal Lab, Department of Physics & Astrophysics, University of Delhi, Delhi-7 (India)

    2017-04-01

    Large sized single crystal of K{sub 2}ZnCl{sub 4} (KZC) was grown by Czochralski (Cz) technique. Structural parameters of KZC were determined by Single crystal X-ray diffraction (SCXRD). From DSC analysis and temperature dependent dielectric measurement, KZC crystal was found to show Curie phase transition at 151 °C. TG/DTA confirmed the melting point that was found to be 443 °C. The value of piezoelectric charge coefficient (d{sub 33}) for KZC crystal was found to be 32 pC/N demonstrating their applicability in transducers and piezoelectric devices. Ferroelectric P-E loop for the grown crystal was traced at room temperature and the intrinsic polarization obtained by PUND measurement was found to be 0.1398 μC/cm{sup 2} indicating its applicability in switching devices. The energy band gap for KZC single crystal was found to be 6.13 eV. Vickers micro-hardness test revealed soft nature of KZC single crystals. - Highlights: • Large sized K{sub 2}ZnCl{sub 4} (KZC) single crystal was grown by Czochralski technique. • It possesses high Curie temperature as 151 °C. • d{sub 33} coefficient was found to be 32 pC/N. • Intrinsic polarization measured by PUND. • Its direct band gap energy was calculated to be 6.13 eV.