WorldWideScience

Sample records for optical mask metrology

  1. Optical metrology

    CERN Document Server

    Gåsvik, Kjell J

    2003-01-01

    New material on computerized optical processes, computerized ray tracing, and the fast Fourier transform, Bibre-Bragg sensors, and temporal phase unwrapping.* New introductory sections to all chapters.* Detailed discussion on lasers and laser principles, including an introduction to radiometry and photometry.* Thorough coverage of the CCD camera.

  2. Integration of mask and silicon metrology in DFM

    Science.gov (United States)

    Matsuoka, Ryoichi; Mito, Hiroaki; Sugiyama, Akiyuki; Toyoda, Yasutaka

    2009-03-01

    We have developed a highly integrated method of mask and silicon metrology. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. We have inspected the high accuracy, stability and reproducibility in the experiments of integration. The accuracy is comparable with that of the mask and silicon CD-SEM metrology. In this report, we introduce the experimental results and the application. As shrinkage of design rule for semiconductor device advances, OPC (Optical Proximity Correction) goes aggressively dense in RET (Resolution Enhancement Technology). However, from the view point of DFM (Design for Manufacturability), the cost of data process for advanced MDP (Mask Data Preparation) and mask producing is a problem. Such trade-off between RET and mask producing is a big issue in semiconductor market especially in mask business. Seeing silicon device production process, information sharing is not completely organized between design section and production section. Design data created with OPC and MDP should be linked to process control on production. But design data and process control data are optimized independently. Thus, we provided a solution of DFM: advanced integration of mask metrology and silicon metrology. The system we propose here is composed of followings. 1) Design based recipe creation: Specify patterns on the design data for metrology. This step is fully automated since they are interfaced with hot spot coordinate information detected by various verification methods. 2) Design based image acquisition: Acquire the images of mask and silicon automatically by a recipe based on the pattern design of CD-SEM.It is a robust automated step because a wide range of design data is used for the image acquisition. 3) Contour profiling and GDS data generation: An image profiling process is applied to the acquired image based

  3. Advanced optical modeling of TiN metal hard mask for scatterometric critical dimension metrology

    Science.gov (United States)

    Ebersbach, Peter; Urbanowicz, Adam M.; Likhachev, Dmitriy; Hartig, Carsten

    2017-03-01

    The majority of scatterometric production control models assume constant optical properties of the materials and only dimensional parameters are allowed to vary. However, this assumption, especially in case of thin-metal films, negatively impacts model precision and accuracy. In this work we focus on optical modeling of the TiN metal hardmask for scatterometry applications. Since the dielectric function of TiN exhibits thickness dependence, we had to take this fact into account. Moreover, presence of the highly absorbing films influences extracted thicknesses of dielectric layers underneath the metal films. The later phenomenon is often not reflected by goodness of fit. We show that accurate optical modeling of metal is essential to achieve desired scatterometric model quality for automatic process control in microelectronic production. Presented modeling methodology can be applied to other TiN applications such as diffusion barriers and metal gates as well as for other metals used in microelectronic manufacturing for all technology nodes.

  4. New method of 2-dimensional metrology using mask contouring

    Science.gov (United States)

    Matsuoka, Ryoichi; Yamagata, Yoshikazu; Sugiyama, Akiyuki; Toyoda, Yasutaka

    2008-10-01

    We have developed a new method of accurately profiling and measuring of a mask shape by utilizing a Mask CD-SEM. The method is intended to realize high accuracy, stability and reproducibility of the Mask CD-SEM adopting an edge detection algorithm as the key technology used in CD-SEM for high accuracy CD measurement. In comparison with a conventional image processing method for contour profiling, this edge detection method is possible to create the profiles with much higher accuracy which is comparable with CD-SEM for semiconductor device CD measurement. This method realizes two-dimensional metrology for refined pattern that had been difficult to measure conventionally by utilizing high precision contour profile. In this report, we will introduce the algorithm in general, the experimental results and the application in practice. As shrinkage of design rule for semiconductor device has further advanced, an aggressive OPC (Optical Proximity Correction) is indispensable in RET (Resolution Enhancement Technology). From the view point of DFM (Design for Manufacturability), a dramatic increase of data processing cost for advanced MDP (Mask Data Preparation) for instance and surge of mask making cost have become a big concern to the device manufacturers. This is to say, demands for quality is becoming strenuous because of enormous quantity of data growth with increasing of refined pattern on photo mask manufacture. In the result, massive amount of simulated error occurs on mask inspection that causes lengthening of mask production and inspection period, cost increasing, and long delivery time. In a sense, it is a trade-off between the high accuracy RET and the mask production cost, while it gives a significant impact on the semiconductor market centered around the mask business. To cope with the problem, we propose the best method of a DFM solution using two-dimensional metrology for refined pattern.

  5. Optical metrology for advanced process control: full module metrology solutions

    Science.gov (United States)

    Bozdog, Cornel; Turovets, Igor

    2016-03-01

    Optical metrology is the workhorse metrology in manufacturing and key enabler to patterning process control. Recent advances in device architecture are gradually shifting the need for process control from the lithography module to other patterning processes (etch, trim, clean, LER/LWR treatments, etc..). Complex multi-patterning integration solutions, where the final pattern is the result of multiple process steps require a step-by-step holistic process control and a uniformly accurate holistic metrology solution for pattern transfer for the entire module. For effective process control, more process "knobs" are needed, and a tighter integration of metrology with process architecture.

  6. In-cell overlay metrology by using optical metrology tool

    Science.gov (United States)

    Lee, Honggoo; Han, Sangjun; Hong, Minhyung; Kim, Seungyoung; Lee, Jieun; Lee, DongYoung; Oh, Eungryong; Choi, Ahlin; Park, Hyowon; Liang, Waley; Choi, DongSub; Kim, Nakyoon; Lee, Jeongpyo; Pandev, Stilian; Jeon, Sanghuck; Robinson, John C.

    2018-03-01

    Overlay is one of the most critical process control steps of semiconductor manufacturing technology. A typical advanced scheme includes an overlay feedback loop based on after litho optical imaging overlay metrology on scribeline targets. The after litho control loop typically involves high frequency sampling: every lot or nearly every lot. An after etch overlay metrology step is often included, at a lower sampling frequency, in order to characterize and compensate for bias. The after etch metrology step often involves CD-SEM metrology, in this case in-cell and ondevice. This work explores an alternative approach using spectroscopic ellipsometry (SE) metrology and a machine learning analysis technique. Advanced 1x nm DRAM wafers were prepared, including both nominal (POR) wafers with mean overlay offsets, as well as DOE wafers with intentional across wafer overlay modulation. After litho metrology was measured using optical imaging metrology, as well as after etch metrology using both SE and CD-SEM for comparison. We investigate 2 types of machine learning techniques with SE data: model-less and model-based, showing excellent performance for after etch in-cell on-device overlay metrology.

  7. Metrology for Freeform Optics

    Data.gov (United States)

    National Aeronautics and Space Administration — Science requirements for optical instrumentation are requiring larger fields of view and faster f-numbers to complete their objectives.   Additionally, opportunities...

  8. Emerging technology for astronomical optics metrology

    Science.gov (United States)

    Trumper, Isaac; Jannuzi, Buell T.; Kim, Dae Wook

    2018-05-01

    Next generation astronomical optics will enable science discoveries across all fields and impact the way we perceive the Universe in which we live. To build these systems, optical metrology tools have been developed that push the boundary of what is possible. We present a summary of a few key metrology technologies that we believe are critical for the coming generation of optical surfaces.

  9. Future metrology needs for FEL reflective optics

    International Nuclear Information System (INIS)

    Assoufid, L.

    2000-01-01

    An International Workshop on Metrology for X-ray and Neutron Optics has been held March 16-17, 2000, at the Advanced Photon Source, Argonne National Laboratory, near Chicago, Illinois (USA). The workshop gathered engineers and scientists from both the U.S. and around the world to evaluate metrology instrumentation and methods used to characterize surface figure and finish for long grazing incidence optics used in beamlines at synchrotrons radiation sources. This two-day workshop was motivated by the rapid evolution in the performance of x-ray and neutron sources along with requirements in optics figure and finish. More specifically, the performance of future light sources, such as free-electron laser (FEL)-based x-ray sources, is being pushed to new limits in term of both brilliance and coherence. As a consequence, tolerances on surface figure and finish of the next generation of optics are expected to become tighter. The timing of the workshop provided an excellent opportunity to study the problem, evaluate the state of the art in metrology instrumentation, and stimulate innovation on future metrology instruments and techniques to be used to characterize these optics. This paper focuses on FEL optics and metrology needs. (A more comprehensive summary of the workshop can be found elsewhere.) The performance and limitations of current metrology instrumentation will be discussed and recommendations from the workshop on future metrology development to meet the FEL challenges will be detailed

  10. Future metrology needs for FEL reflective optics.

    Energy Technology Data Exchange (ETDEWEB)

    Assoufid, L.

    2000-09-21

    An International Workshop on Metrology for X-ray and Neutron Optics has been held March 16-17, 2000, at the Advanced Photon Source, Argonne National Laboratory, near Chicago, Illinois (USA). The workshop gathered engineers and scientists from both the U.S. and around the world to evaluate metrology instrumentation and methods used to characterize surface figure and finish for long grazing incidence optics used in beamlines at synchrotrons radiation sources. This two-day workshop was motivated by the rapid evolution in the performance of x-ray and neutron sources along with requirements in optics figure and finish. More specifically, the performance of future light sources, such as free-electron laser (FEL)-based x-ray sources, is being pushed to new limits in term of both brilliance and coherence. As a consequence, tolerances on surface figure and finish of the next generation of optics are expected to become tighter. The timing of the workshop provided an excellent opportunity to study the problem, evaluate the state of the art in metrology instrumentation, and stimulate innovation on future metrology instruments and techniques to be used to characterize these optics. This paper focuses on FEL optics and metrology needs. (A more comprehensive summary of the workshop can be found elsewhere.) The performance and limitations of current metrology instrumentation will be discussed and recommendations from the workshop on future metrology development to meet the FEL challenges will be detailed.

  11. Optical metrology techniques for dimensional stability measurements

    NARCIS (Netherlands)

    Ellis, Jonathan David

    2010-01-01

    This thesis work is optical metrology techniques to determine material stability. In addition to displacement interferometry, topics such as periodic nonlinearity, Fabry-Perot interferometry, refractometry, and laser stabilization are covered.

  12. Optical vortex metrology: Are phase singularities foes or friends in optical metrology?

    DEFF Research Database (Denmark)

    Takeda, M.; Wang, W.; Hanson, Steen Grüner

    2008-01-01

    We raise an issue whether phase singularities are foes or friends in optical metrology, and give an answer by introducing the principle and applications of a new technique which we recently proposed for displacement and flow measurements. The technique is called optical vortex metrology because i...

  13. 7th International Workshop on Advanced Optical Imaging and Metrology

    CERN Document Server

    2014-01-01

    In continuation of the FRINGE Workshop Series this Proceeding contains all contributions presented at the 7. International Workshop on Advanced Optical Imaging and Metrology. The FRINGE Workshop Series is dedicated to the presentation, discussion and dissemination of recent results in Optical Imaging and Metrology. Topics of particular interest for the 7. Workshop are: - New methods and tools for the generation, acquisition, processing, and evaluation of data in Optical Imaging and Metrology (digital wavefront engineering, computational imaging, model-based reconstruction, compressed sensing, inverse problems solution) - Application-driven technologies in Optical Imaging and Metrology (high-resolution, adaptive, active, robust, reliable, flexible, in-line, real-time) - High-dynamic range solutions in Optical Imaging and Metrology (from macro to nano) - Hybrid technologies in Optical Imaging and Metrology (hybrid optics, sensor and data fusion, model-based solutions, multimodality) - New optical sensors, imagi...

  14. Metrology of reflection optics for synchrotron radiation

    International Nuclear Information System (INIS)

    Takacs, P.Z.

    1985-09-01

    Recent years have seen an almost explosive growth in the number of beam lines on new and existing synchrotron radiation facilities throughout the world. The need for optical components to utilize the unique characteristics of synchrotron radiation has increased accordingly. Unfortunately, the technology to manufacture and measure the large, smooth, exotic optical surfaces required to focus and steer the synchrotron radiation beam has not progressed as rapidly as the operational demands on these components. Most companies do not wish to become involved with a project that requires producing a single, very expensive, aspheric optic with surface roughness and figure tolerances that are beyond their capabilities to measure. This paper will review some of the experiences of the National Synchrotron Light Source in procuring grazing incidence optical components over the past several years. We will review the specification process - how it is related to the function of the optic, and how it relates to the metrology available during the manufacturing process and after delivery to the user's laboratory. We will also discuss practical aspects of our experience with new technologies, such as single point diamond turning of metal mirrors and the use of SiC as a mirror material. Recent advances in metrology instrumentation have the potential to move the measurement of surface figure and finish from the research laboratory into the optical shop, which should stimulate growth and interest in the manufacturing of optics to meet the needs of the synchrotron radiation user community

  15. Optics for Processes, Products and Metrology

    Science.gov (United States)

    Mather, George

    1999-04-01

    Optical physics has a variety of applications in industry, including process inspection, coatings development, vision instrumentation, spectroscopy, and many others. Optics has been used extensively in the design of solar energy collection systems and coatings, for example. Also, with the availability of good CCD cameras and fast computers, it has become possible to develop real-time inspection and metrology devices that can accommodate the high throughputs encountered in modern production processes. More recently, developments in moiré interferometry show great promise for applications in the basic metals and electronics industries. The talk will illustrate applications of optics by discussing process inspection techniques for defect detection, part dimensioning, birefringence measurement, and the analysis of optical coatings in the automotive, glass, and optical disc industries. In particular, examples of optical techniques for the quality control of CD-R, MO, and CD-RW discs will be presented. In addition, the application of optical concepts to solar energy collector design and to metrology by moiré techniques will be discussed. Finally, some of the modern techniques and instruments used for qualitative and quantitative material analysis will be presented.

  16. Forum metrology 2009: control of optics, targets and optical analyzers

    International Nuclear Information System (INIS)

    Desenne, D.; Andre, R.

    2010-01-01

    The 1. 'Forum Metrologie' of the CEA/DAM has been held in the 'Institut Laser et Plasma' on the December 9, 2009, close to the 'Centre d'etudes Scientifiques et Techniques d'Aquitaine'. It has been set up by the 'Departement Lasers de Puissance'. The chosen thematic was the metrology around laser experiments, with a special focus on the metrology of the dedicated optics, targets and optical analysers. The talks have shown the progress and difficulties in each of these fields. (authors)

  17. Registration performance on EUV masks using high-resolution registration metrology

    Science.gov (United States)

    Steinert, Steffen; Solowan, Hans-Michael; Park, Jinback; Han, Hakseung; Beyer, Dirk; Scherübl, Thomas

    2016-10-01

    Next-generation lithography based on EUV continues to move forward to high-volume manufacturing. Given the technical challenges and the throughput concerns a hybrid approach with 193 nm immersion lithography is expected, at least in the initial state. Due to the increasing complexity at smaller nodes a multitude of different masks, both DUV (193 nm) and EUV (13.5 nm) reticles, will then be required in the lithography process-flow. The individual registration of each mask and the resulting overlay error are of crucial importance in order to ensure proper functionality of the chips. While registration and overlay metrology on DUV masks has been the standard for decades, this has yet to be demonstrated on EUV masks. Past generations of mask registration tools were not necessarily limited in their tool stability, but in their resolution capabilities. The scope of this work is an image placement investigation of high-end EUV masks together with a registration and resolution performance qualification. For this we employ a new generation registration metrology system embedded in a production environment for full-spec EUV masks. This paper presents excellent registration performance not only on standard overlay markers but also on more sophisticated e-beam calibration patterns.

  18. Advanced applications of scatterometry based optical metrology

    Science.gov (United States)

    Dixit, Dhairya; Keller, Nick; Kagalwala, Taher; Recchia, Fiona; Lifshitz, Yevgeny; Elia, Alexander; Todi, Vinit; Fronheiser, Jody; Vaid, Alok

    2017-03-01

    The semiconductor industry continues to drive patterning solutions that enable devices with higher memory storage capacity, faster computing performance, and lower cost per transistor. These developments in the field of semiconductor manufacturing along with the overall minimization of the size of transistors require continuous development of metrology tools used for characterization of these complex 3D device architectures. Optical scatterometry or optical critical dimension (OCD) is one of the most prevalent inline metrology techniques in semiconductor manufacturing because it is a quick, precise and non-destructive metrology technique. However, at present OCD is predominantly used to measure the feature dimensions such as line-width, height, side-wall angle, etc. of the patterned nano structures. Use of optical scatterometry for characterizing defects such as pitch-walking, overlay, line edge roughness, etc. is fairly limited. Inspection of process induced abnormalities is a fundamental part of process yield improvement. It provides process engineers with important information about process errors, and consequently helps optimize materials and process parameters. Scatterometry is an averaging technique and extending it to measure the position of local process induced defectivity and feature-to-feature variation is extremely challenging. This report is an overview of applications and benefits of using optical scatterometry for characterizing defects such as pitch-walking, overlay and fin bending for advanced technology nodes beyond 7nm. Currently, the optical scatterometry is based on conventional spectroscopic ellipsometry and spectroscopic reflectometry measurements, but generalized ellipsometry or Mueller matrix spectroscopic ellipsometry data provides important, additional information about complex structures that exhibit anisotropy and depolarization effects. In addition the symmetry-antisymmetry properties associated with Mueller matrix (MM) elements

  19. Optical vortex metrology for non-destructive testing

    DEFF Research Database (Denmark)

    Wang, W.; Hanson, Steen Grüner

    2009-01-01

    Based on the phase singularities in optical fields, we introduce a new technique, referred to as Optical Vortex Metrology, and demonstrate its application to nano- displacement, flow measurements and biological kinematic analysis.......Based on the phase singularities in optical fields, we introduce a new technique, referred to as Optical Vortex Metrology, and demonstrate its application to nano- displacement, flow measurements and biological kinematic analysis....

  20. Optical metrology tools for the Virgo projet

    Science.gov (United States)

    Loriette, V.

    For more than thirty years the search for gravitationnal waves, predicted by Einstein's relativistic theory of gravitation, has been an intense research field in experimental as well as theoretical physics. Today, with the constant advance of technology in optics, lasers, data analysis and processing, ... a promising way of directly detecting gravitationnal waves with earth-based instruments is optical interferometry. Before the end of this century many experiments will be carried on in Australia, Europe, Japan and the United States to detect the passage of a gravitationnal wave through giant Michelson-type interferometers. The effects predicted are so small, (a gravitationnal wave changes the length of three kilometer long arms by one thousandth of a fermi) that the need for “perfect” optical components is a key to the success of these experiments. Still a few years ago it would have been impossible to make optical components that would satisfy the required specifications for such interferometric detectors. For nearly ten years constant R&D efforts in optical coating manufacturing, optical material fabrication and optical metrology, allow us today to make such components. This text is intended to describe the field of optical metrology as it is needed for the testing of optical parts having performances far beyond than everything previously made. The first chapter is an introduction to gravitationnal waves, their sources and their effects on detectors. Starting by newtonian mechanics we jump rapidly to the general theory of relativity and describe particular solutions of Einstein's equations in the case of weak gravitationnal fields, which are periodic perturbations of the space-time metric in the form of plane waves, the so-called gravitationnal waves. We present various candidate sources, terrestrial and extra-terrestrial and give a short description of the two families of detectors: resonnant bars and optical interferometers. The second part of this chapter

  1. Handbook of 3D machine vision optical metrology and imaging

    CERN Document Server

    Zhang, Song

    2013-01-01

    With the ongoing release of 3D movies and the emergence of 3D TVs, 3D imaging technologies have penetrated our daily lives. Yet choosing from the numerous 3D vision methods available can be frustrating for scientists and engineers, especially without a comprehensive resource to consult. Filling this gap, Handbook of 3D Machine Vision: Optical Metrology and Imaging gives an extensive, in-depth look at the most popular 3D imaging techniques. It focuses on noninvasive, noncontact optical methods (optical metrology and imaging). The handbook begins with the well-studied method of stereo vision and

  2. Extension of optical lithography by mask-litho integration with computational lithography

    Science.gov (United States)

    Takigawa, T.; Gronlund, K.; Wiley, J.

    2010-05-01

    Wafer lithography process windows can be enlarged by using source mask co-optimization (SMO). Recently, SMO including freeform wafer scanner illumination sources has been developed. Freeform sources are generated by a programmable illumination system using a micro-mirror array or by custom Diffractive Optical Elements (DOE). The combination of freeform sources and complex masks generated by SMO show increased wafer lithography process window and reduced MEEF. Full-chip mask optimization using source optimized by SMO can generate complex masks with small variable feature size sub-resolution assist features (SRAF). These complex masks create challenges for accurate mask pattern writing and low false-defect inspection. The accuracy of the small variable-sized mask SRAF patterns is degraded by short range mask process proximity effects. To address the accuracy needed for these complex masks, we developed a highly accurate mask process correction (MPC) capability. It is also difficult to achieve low false-defect inspections of complex masks with conventional mask defect inspection systems. A printability check system, Mask Lithography Manufacturability Check (M-LMC), is developed and integrated with 199-nm high NA inspection system, NPI. M-LMC successfully identifies printable defects from all of the masses of raw defect images collected during the inspection of a complex mask. Long range mask CD uniformity errors are compensated by scanner dose control. A mask CD uniformity error map obtained by mask metrology system is used as input data to the scanner. Using this method, wafer CD uniformity is improved. As reviewed above, mask-litho integration technology with computational lithography is becoming increasingly important.

  3. A new approach to stitching optical metrology data

    Science.gov (United States)

    King, Christopher W.

    The next generation of optical instruments, including telescopes and imaging apparatus, will generate an increased requirement for larger and more complex optical forms. A major limiting factor for the production of such optical components is the metrology: how do we measure such parts and with respect to what reference datum This metrology can be thought of as part of a complete cycle in the production of optical components and it is currently the most challenging aspect of production. This thesis investigates a new and complete approach to stitching optical metrology data to extend the effective aperture or, in future, the dynamic range of optical metrology instruments. A practical approach is used to build up a complete process for stitching on piano and spherical parts. The work forms a basis upon which a stitching system for aspheres might be developed in the future, which is inherently more complicated. Beginning with a historical perspective and a review of optical polishing and metrology, the work presented relates the commercially available metrology instruments to the stitching process developed. The stitching is then performed by a numerical optimization routine that seeks to join together overlapping sub-aperture measurements by consideration of the aberrations introduced by the measurement scenario, and by the overlap areas between measurements. The stitching is part of a larger project, the PPARC Optical Manipulation and Metrology project, and was to benefit from new wavefront sensing technology developed by a project partner, and to be used for the sub-aperture measurement. Difficult mathematical problems meant that such a wavefront sensor was not avail able for this work and a work-around was therefore developed using commercial instruments. The techniques developed can be adapted to work on commercial ma chine platforms, and in partuicular, the OMAM NPL/UCL swing-arm profilometer described in chapter 5, or the computer controlled polishing machines

  4. Optical antennas for far and near field metrology

    NARCIS (Netherlands)

    Silvestri, F.; Bernal Arango, F.; Vendel, K.J.A.; Gerini, G.; Bäumer, S.M.B.; Koenderink, A.F.

    2016-01-01

    This paper presents the use of optical antennas in metrology scenarios. Two design concepts are presented: dielectric nanoresonator arrays and plasmonic nanoantennas arrays. The first ones are able to focus an incident light beam at an arbitrary focal plane. The nanoantennas arrays can be employed

  5. Laser metrology and optic active control system for GAIA

    Science.gov (United States)

    D'Angelo, F.; Bonino, L.; Cesare, S.; Castorina, G.; Mottini, S.; Bertinetto, F.; Bisi, M.; Canuto, E.; Musso, F.

    2017-11-01

    The Laser Metrology and Optic Active Control (LM&OAC) program has been carried out under ESA contract with the purpose to design and validate a laser metrology system and an actuation mechanism to monitor and control at microarcsec level the stability of the Basic Angle (angle between the lines of sight of the two telescopes) of GAIA satellite. As part of the program, a breadboard (including some EQM elements) of the laser metrology and control system has been built and submitted to functional, performance and environmental tests. In the followings we describe the mission requirements, the system architecture, the breadboard design, and finally the performed validation tests. Conclusion and appraisals from this experience are also reported.

  6. At-wavelength Optical Metrology Development at the ALS

    International Nuclear Information System (INIS)

    Yuan, Sheng Sam; Goldberg, Kenneth A.; Yashchuk, Valeriy V.; Celestre, Richard; Mochi, Iacopo; Macdougall, James; Morrison, Gregory Y.; Smith, Brian V.; Domning, Edward E.; McKinney, Wayne R.; Warwick, Tony

    2010-01-01

    Nano-focusing and brightness preservation for ever brighter synchrotron radiation and free electron laser beamlines require surface slope tolerances of x-ray optics on the order of 100 nrad. While the accuracy of fabrication and ex situ metrology of x-ray mirrors has improved over time, beamline in situ performance of the optics is often limited by application specific factors such as x-ray beam heat loading, temperature drift, alignment, vibration, etc. In the present work, we discuss the recent results from the Advanced Light Source developing high accuracy, in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad accuracy surface slope measurements with reflecting x-ray optics. The techniques will ultimately allow closed-loop feedback systems to be implemented for x-ray nano-focusing. In addition, we present a dedicated metrology beamline endstation, applicable to a wide range of in situ metrology and test experiments. The design and performance of a bendable Kirkpatrick-Baez (KB) mirror with active temperature stabilization will also be presented. The mirror is currently used to study, refine, and optimize in situ mirror alignment, bending and metrology methods essential for nano-focusing application.

  7. Coherence enhanced quantum metrology in a nonequilibrium optical molecule

    Science.gov (United States)

    Wang, Zhihai; Wu, Wei; Cui, Guodong; Wang, Jin

    2018-03-01

    We explore the quantum metrology in an optical molecular system coupled to two environments with different temperatures, using a quantum master equation beyond secular approximation. We discover that the steady-state coherence originating from and sustained by the nonequilibrium condition can enhance quantum metrology. We also study the quantitative measures of the nonequilibrium condition in terms of the curl flux, heat current and entropy production at the steady state. They are found to grow with temperature difference. However, an apparent paradox arises considering the contrary behaviors of the steady-state coherence and the nonequilibrium measures in relation to the inter-cavity coupling strength. This paradox is resolved by decomposing the heat current into a population part and a coherence part. Only the latter, the coherence part of the heat current, is tightly connected to the steady-state coherence and behaves similarly with respect to the inter-cavity coupling strength. Interestingly, the coherence part of the heat current flows from the low-temperature reservoir to the high-temperature reservoir, opposite to the direction of the population heat current. Our work offers a viable way to enhance quantum metrology for open quantum systems through steady-state coherence sustained by the nonequilibrium condition, which can be controlled and manipulated to maximize its utility. The potential applications go beyond quantum metrology and extend to areas such as device designing, quantum computation and quantum technology in general.

  8. Fringe pattern analysis for optical metrology theory, algorithms, and applications

    CERN Document Server

    Servin, Manuel; Padilla, Moises

    2014-01-01

    The main objective of this book is to present the basic theoretical principles and practical applications for the classical interferometric techniques and the most advanced methods in the field of modern fringe pattern analysis applied to optical metrology. A major novelty of this work is the presentation of a unified theoretical framework based on the Fourier description of phase shifting interferometry using the Frequency Transfer Function (FTF) along with the theory of Stochastic Process for the straightforward analysis and synthesis of phase shifting algorithms with desired properties such

  9. LISA Pathfinder: Optical Metrology System monitoring during operations

    Science.gov (United States)

    Audley, Heather E.; LISA Pathfinder Collaboration

    2017-05-01

    The LISA Pathfinder (LPF) mission has demonstrated excellent performance. In addition to having surpassed the main mission goals, data has been collected from the various subsystems throughout the duration of the mission. This data is a valuable resource, both for a more complete understanding of the LPF satellite and the differential acceleration measurements, as well as for the design of the future Laser Interferometer Space Antenna (LISA) mission. Initial analysis of the Optical Metrology System (OMS) data was performed as part of daily system monitoring, and more in-depth analyses are ongoing. This contribution presents an overview of these activities along with an introduction to the OMS.

  10. Adhesive Bonding for Optical Metrology Systems in Space Applications

    International Nuclear Information System (INIS)

    Gohlke, Martin; Schuldt, Thilo; Braxmaier, Claus; Döringshoff, Klaus; Peters, Achim; Johann, Ulrich; Weise, Dennis

    2015-01-01

    Laser based metrology systems become more and more attractive for space applications and are the core elements of planned missions such as LISA (NGO, eLISA) or NGGM where laser interferometry is used for distance measurements between satellites. The GRACE-FO mission will for the first time demonstrate a Laser Ranging Instrument (LRI) in space, starting 2017. Laser based metrology also includes optical clocks/references, either as ultra-stable light source for high sensitivity interferometry or as scientific payload e.g. proposed in fundamental physics missions such as mSTAR (mini SpaceTime Asymmetry Research), a mission dedicated to perform a Kennedy-Thorndike experiment on a satellite in a low-Earth orbit. To enable the use of existing optical laboratory setups, optimization with respect to power consumption, weight and dimensions is necessary. At the same time the thermal and structural stability must be increased. Over the last few years we investigated adhesive bonding of optical components to thermally highly stable glass ceramics as an easy-to-handle assembly integration technology. Several setups were implemented and tested for potential later use in space applications. We realized a heterodyne LISA related interferometer with demonstrated noise levels in the pm-range for translation measurement and nano-radiant-range for tilt measurements and two iodine frequency references on Elegant Breadboard (EBB) and Engineering Model (EM) level with frequency stabilities in the 10 -15 range for longer integration times. The EM setup was thermally cycled and vibration tested. (paper)

  11. Generic distortion model for metrology under optical microscopes

    Science.gov (United States)

    Liu, Xingjian; Li, Zhongwei; Zhong, Kai; Chao, YuhJin; Miraldo, Pedro; Shi, Yusheng

    2018-04-01

    For metrology under optical microscopes, lens distortion is the dominant source of error. Previous distortion models and correction methods mostly rely on the assumption that parametric distortion models require a priori knowledge of the microscopes' lens systems. However, because of the numerous optical elements in a microscope, distortions can be hardly represented by a simple parametric model. In this paper, a generic distortion model considering both symmetric and asymmetric distortions is developed. Such a model is obtained by using radial basis functions (RBFs) to interpolate the radius and distortion values of symmetric distortions (image coordinates and distortion rays for asymmetric distortions). An accurate and easy to implement distortion correction method is presented. With the proposed approach, quantitative measurement with better accuracy can be achieved, such as in Digital Image Correlation for deformation measurement when used with an optical microscope. The proposed technique is verified by both synthetic and real data experiments.

  12. Present status of metrology of electro-optical surveillance systems

    Science.gov (United States)

    Chrzanowski, K.

    2017-10-01

    There has been a significant progress in equipment for testing electro-optical surveillance systems over the last decade. Modern test systems are increasingly computerized, employ advanced image processing and offer software support in measurement process. However, one great challenge, in form of relative low accuracy, still remains not solved. It is quite common that different test stations, when testing the same device, produce different results. It can even happen that two testing teams, while working on the same test station, with the same tested device, produce different results. Rapid growth of electro-optical technology, poor standardization, limited metrology infrastructure, subjective nature of some measurements, fundamental limitations from laws of physics, tendering rules and advances in artificial intelligence are major factors responsible for such situation. Regardless, next decade should bring significant improvements, since improvement in measurement accuracy is needed to sustain fast growth of electro-optical surveillance technology.

  13. Geodesy and metrology with a transportable optical clock

    Science.gov (United States)

    Grotti, Jacopo; Koller, Silvio; Vogt, Stefan; Häfner, Sebastian; Sterr, Uwe; Lisdat, Christian; Denker, Heiner; Voigt, Christian; Timmen, Ludger; Rolland, Antoine; Baynes, Fred N.; Margolis, Helen S.; Zampaolo, Michel; Thoumany, Pierre; Pizzocaro, Marco; Rauf, Benjamin; Bregolin, Filippo; Tampellini, Anna; Barbieri, Piero; Zucco, Massimo; Costanzo, Giovanni A.; Clivati, Cecilia; Levi, Filippo; Calonico, Davide

    2018-05-01

    Optical atomic clocks, due to their unprecedented stability1-3 and uncertainty3-6, are already being used to test physical theories7,8 and herald a revision of the International System of Units9,10. However, to unlock their potential for cross-disciplinary applications such as relativistic geodesy11, a major challenge remains: their transformation from highly specialized instruments restricted to national metrology laboratories into flexible devices deployable in different locations12-14. Here, we report the first field measurement campaign with a transportable 87Sr optical lattice clock12. We use it to determine the gravity potential difference between the middle of a mountain and a location 90 km away, exploiting both local and remote clock comparisons to eliminate potential clock errors. A local comparison with a 171Yb lattice clock15 also serves as an important check on the international consistency of independently developed optical clocks. This campaign demonstrates the exciting prospects for transportable optical clocks.

  14. Some answers to new challenges in optical metrology

    Science.gov (United States)

    Osten, W.

    2008-09-01

    The visible trend in the implementation of new technologies and creation of new products is the continuous reduction of feature sizes. However, in the same way as the feature sizes are decreasing, the theoretical and practical constraints of making them and ensuring their quality are increasing. Consequently, modern production and inspection technologies are confronted with a bundle of challenges. An important barrier for optical imaging and sensing is the diffraction limited lateral resolution. The observation of this physical limitation is of increasing importance, not only for microscopic techniques but also for the application of 3D-measurement techniques on wafer scale level. A further challenge is the reliable detection of imperfections and material faults within the production chain. This means in-line metrology/defectoscopy is a must for future production systems. Only the real-time feedback of the inspection results into the production process can contribute to a consistent quality assurance in processes with high cost risk. Moreover the reliable measurement of free form surfaces, both technical and optical, the assurance of the traceability and the certified assessment of the uncertainty of the measurement results are ongoing challenges. The challenges and the physical limitations are addressed here by new approaches for testing semiconductor structures with enhanced resolution, the measurement of aspheric lenses with increased flexibility and the inspection of micro components with improved traceability.

  15. Comparison of asphere measurements by tactile and optical metrological instruments

    NARCIS (Netherlands)

    Bergmans, R.H.; Nieuwenkamp, H.J.; Kok, G.J.P.; Blobel, G.; Nouira, H.; Küng, A.; Baas, M.; Voert, M.J.A. te; Baer, G.; Stuerwald, S.

    2015-01-01

    A comparison of topography measurements of aspherical surfaces was carried out by European metrology institutes, other research institutes and a company as part of an European metrology research project. In this paper the results of this comparison are presented. Two artefacts were circulated, a

  16. Improvement of radiographs by means of optical masks

    International Nuclear Information System (INIS)

    Shishov, B.A.; Tereshenko, O.I.; Tyurin, E.I.

    1985-01-01

    High-gradient photographic material improves contrast and detectability of small details. Parts of the radiographs will however tend to be over- or underexposed. The recorded information can be improved by optical masks that modify the light in various parts of the image according to film sensitivity. For screen-film systems an immediate correction of the image by inserted masks results in a better recording of details while the well known detail filtering process improves only the visual detectability of the already recorded information. A special cassette for the generation of masks and a method for the calculation of correction factors for various screen combinations and masks types are described. (author)

  17. Joint optimization of source, mask, and pupil in optical lithography

    Science.gov (United States)

    Li, Jia; Lam, Edmund Y.

    2014-03-01

    Mask topography effects need to be taken into consideration for more advanced resolution enhancement techniques in optical lithography. However, rigorous 3D mask model achieves high accuracy at a large computational cost. This work develops a combined source, mask and pupil optimization (SMPO) approach by taking advantage of the fact that pupil phase manipulation is capable of partially compensating for mask topography effects. We first design the pupil wavefront function by incorporating primary and secondary spherical aberration through the coefficients of the Zernike polynomials, and achieve optimal source-mask pair under the condition of aberrated pupil. Evaluations against conventional source mask optimization (SMO) without incorporating pupil aberrations show that SMPO provides improved performance in terms of pattern fidelity and process window sizes.

  18. Speckle-based at-wavelength metrology of x-ray optics at Diamond Light Source

    Science.gov (United States)

    Wang, Hongchang; Zhou, Tunhe; Kashyap, Yogesh; Sawhney, Kawal

    2017-08-01

    To achieve high resolution and sensitivity on the nanometer scale, further development of X-ray optics is required. Although ex-situ metrology provides valuable information about X-ray optics, the ultimate performance of X-ray optics is critically dependent on the exact nature of the working conditions. Therefore, it is equally important to perform in-situ metrology at the optics' operating wavelength (`at-wavelength' metrology) to optimize the performance of X-ray optics and correct and minimize the collective distortions of the upstream beamline optics, e.g. monochromator, windows, etc. Speckle-based technique has been implemented and further improved at Diamond Light Source. We have demonstrated that the angular sensitivity for measuring the slope error of an optical surface can reach an accuracy of two nanoradians. The recent development of the speckle-based at-wavelength metrology techniques will be presented. Representative examples of the applications of the speckle-based technique will also be given - including optimization of X-ray mirrors and characterization of compound refraction lenses. Such a high-precision metrology technique will be extremely beneficial for the manufacture and in-situ alignment/optimization of X-ray mirrors for next-generation synchrotron beamlines.

  19. A two-step method for fast and reliable EUV mask metrology

    Science.gov (United States)

    Helfenstein, Patrick; Mochi, Iacopo; Rajendran, Rajeev; Yoshitake, Shusuke; Ekinci, Yasin

    2017-03-01

    One of the major obstacles towards the implementation of extreme ultraviolet lithography for upcoming technology nodes in semiconductor industry remains the realization of a fast and reliable detection methods patterned mask defects. We are developing a reflective EUV mask-scanning lensless imaging tool (RESCAN), installed at the Swiss Light Source synchrotron at the Paul Scherrer Institut. Our system is based on a two-step defect inspection method. In the first step, a low-resolution defect map is generated by die to die comparison of the diffraction patterns from areas with programmed defects, to those from areas that are known to be defect-free on our test sample. In a later stage, a die to database comparison will be implemented in which the measured diffraction patterns will be compared to those calculated directly from the mask layout. This Scattering Scanning Contrast Microscopy technique operates purely in the Fourier domain without the need to obtain the aerial image and, given a sufficient signal to noise ratio, defects are found in a fast and reliable way, albeit with a location accuracy limited by the spot size of the incident illumination. Having thus identified rough locations for the defects, a fine scan is carried out in the vicinity of these locations. Since our source delivers coherent illumination, we can use an iterative phase-retrieval method to reconstruct the aerial image of the scanned area with - in principle - diffraction-limited resolution without the need of an objective lens. Here, we will focus on the aerial image reconstruction technique and give a few examples to illustrate the capability of the method.

  20. Dimensional quality control of Ti-Ni dental file by optical coordinate metrology and computed tomography

    DEFF Research Database (Denmark)

    Yagüe-Fabra, J.A.; Tosello, Guido; Ontiveros, S.

    2014-01-01

    Endodontic dental files usually present complex 3D geometries, which make the complete measurement of the component very challenging with conventional micro metrology tools. Computed Tomography (CT) can represent a suitable alternative solution to micro metrology tools based on optical and tactile...... techniques. However, the establishment of CT systems traceability when measuring 3D complex geometries is still an open issue. In this work, to verify the quality of the CT dimensional measurements, the dental file has been measured both with a μCT system and an optical CMM (OCMM). The uncertainty...

  1. Phase shifting white light interferometry using colour CCD for optical metrology and bio-imaging applications

    Science.gov (United States)

    Upputuri, Paul Kumar; Pramanik, Manojit

    2018-02-01

    Phase shifting white light interferometry (PSWLI) has been widely used for optical metrology applications because of their precision, reliability, and versatility. White light interferometry using monochrome CCD makes the measurement process slow for metrology applications. WLI integrated with Red-Green-Blue (RGB) CCD camera is finding imaging applications in the fields optical metrology and bio-imaging. Wavelength dependent refractive index profiles of biological samples were computed from colour white light interferograms. In recent years, whole-filed refractive index profiles of red blood cells (RBCs), onion skin, fish cornea, etc. were measured from RGB interferograms. In this paper, we discuss the bio-imaging applications of colour CCD based white light interferometry. The approach makes the measurement faster, easier, cost-effective, and even dynamic by using single fringe analysis methods, for industrial applications.

  2. An interferometer for high-resolution optical surveillance from GEO - internal metrology breadboard

    Science.gov (United States)

    Bonino, L.; Bresciani, F.; Piasini, G.; Pisani, M.; Cabral, A.; Rebordão, J.; Musso, F.

    2017-11-01

    This paper describes the internal metrology breadboard development activities performed in the frame of the EUCLID CEPA 9 RTP 9.9 "High Resolution Optical Satellite Sensor" project of the WEAO Research Cell by AAS-I and INETI. The Michelson Interferometer Testbed demonstrates the possibility of achieving a cophasing condition between two arms of the optical interferometer starting from a large initial white light Optical Path Difference (OPD) unbalance and of maintaining the fringe pattern stabilized in presence of disturbances.

  3. Photodeposited diffractive optical elements of computer generated masks

    International Nuclear Information System (INIS)

    Mirchin, N.; Peled, A.; Baal-Zedaka, I.; Margolin, R.; Zagon, M.; Lapsker, I.; Verdyan, A.; Azoulay, J.

    2005-01-01

    Diffractive optical elements (DOE) were synthesized on plastic substrates using the photodeposition (PD) technique by depositing amorphous selenium (a-Se) films with argon lasers and UV spectra light. The thin films were deposited typically onto polymethylmethacrylate (PMMA) substrates at room temperature. Scanned beam and contact mask modes were employed using computer-designed DOE lenses. Optical and electron micrographs characterize the surface details. The films were typically 200 nm thick

  4. Optical performances of the FM JEM-X masks

    Science.gov (United States)

    Reglero, V.; Rodrigo, J.; Velasco, T.; Gasent, J. L.; Chato, R.; Alamo, J.; Suso, J.; Blay, P.; Martínez, S.; Doñate, M.; Reina, M.; Sabau, D.; Ruiz-Urien, I.; Santos, I.; Zarauz, J.; Vázquez, J.

    2001-09-01

    The JEM-X Signal Multiplexing Systems are large HURA codes "written" in a pure tungsten plate 0.5 mm thick. 24.247 hexagonal pixels (25% open) are spread over a total area of 535 mm diameter. The tungsten plate is embedded in a mechanical structure formed by a Ti ring, a pretensioning system (Cu-Be) and an exoskeleton structure that provides the required stiffness. The JEM-X masks differ from the SPI and IBIS masks on the absence of a code support structure covering the mask assembly. Open pixels are fully transparent to X-rays. The scope of this paper is to report the optical performances of the FM JEM-X masks defined by uncertainties on the pixel location (centroid) and size coming from the manufacturing and assembly processes. Stability of the code elements under thermoelastic deformations is also discussed. As a general statement, JEM-X Mask optical properties are nearly one order of magnitude better than specified in 1994 during the ESA instrument selection.

  5. Surface slope metrology of highly curved x-ray optics with an interferometric microscope

    Science.gov (United States)

    Gevorkyan, Gevork S.; Centers, Gary; Polonska, Kateryna S.; Nikitin, Sergey M.; Lacey, Ian; Yashchuk, Valeriy V.

    2017-09-01

    The development of deterministic polishing techniques has given rise to vendors that manufacture high quality threedimensional x-ray optics. The surface metrology on these optics remains a difficult task. For the fabrication, vendors usually use unique surface metrology tools, generally developed on site, that are not available in the optical metrology labs at x-ray facilities. At the Advanced Light Source X-Ray Optics Laboratory, we have developed a rather straightforward interferometric-microscopy-based procedure capable of sub microradian characterization of sagittal slope variation of x-ray optics for two-dimensionally focusing and collimating (such as ellipsoids, paraboloids, etc.). In the paper, we provide the mathematical foundation of the procedure and describe the related instrument calibration. We also present analytical expression describing the ideal surface shape in the sagittal direction of a spheroid specified by the conjugate parameters of the optic's beamline application. The expression is useful when analyzing data obtained with such optics. The high efficiency of the developed measurement and data analysis procedures is demonstrated in results of measurements with a number of x-ray optics with sagittal radius of curvature between 56 mm and 480 mm. We also discuss potential areas of further improvement.

  6. Ultrabroadband optical chirp linearization for precision metrology applications.

    Science.gov (United States)

    Roos, Peter A; Reibel, Randy R; Berg, Trenton; Kaylor, Brant; Barber, Zeb W; Babbitt, Wm Randall

    2009-12-01

    We demonstrate precise linearization of ultrabroadband laser frequency chirps via a fiber-based self-heterodyne technique to enable extremely high-resolution, frequency-modulated cw laser-radar (LADAR) and a wide range of other metrology applications. Our frequency chirps cover bandwidths up to nearly 5 THz with frequency errors as low as 170 kHz, relative to linearity. We show that this performance enables 31-mum transform-limited LADAR range resolution (FWHM) and 86 nm range precisions over a 1.5 m range baseline. Much longer range baselines are possible but are limited by atmospheric turbulence and fiber dispersion.

  7. Forum metrology 2009: control of optics, targets and optical analyzers; Forum metrologie 2009: controle des optiques, cibles et analyseurs optiques

    Energy Technology Data Exchange (ETDEWEB)

    Desenne, D.; Andre, R.

    2010-07-01

    The 1. 'Forum Metrologie' of the CEA/DAM has been held in the 'Institut Laser et Plasma' on the December 9, 2009, close to the 'Centre d'etudes Scientifiques et Techniques d'Aquitaine'. It has been set up by the 'Departement Lasers de Puissance'. The chosen thematic was the metrology around laser experiments, with a special focus on the metrology of the dedicated optics, targets and optical analysers. The talks have shown the progress and difficulties in each of these fields. (authors)

  8. Correlation methods in optical metrology with state-of-the-art x-ray mirrors

    Science.gov (United States)

    Yashchuk, Valeriy V.; Centers, Gary; Gevorkyan, Gevork S.; Lacey, Ian; Smith, Brian V.

    2018-01-01

    The development of fully coherent free electron lasers and diffraction limited storage ring x-ray sources has brought to focus the need for higher performing x-ray optics with unprecedented tolerances for surface slope and height errors and roughness. For example, the proposed beamlines for the future upgraded Advance Light Source, ALS-U, require optical elements characterized by a residual slope error of optics with a length of up to one meter. However, the current performance of x-ray optical fabrication and metrology generally falls short of these requirements. The major limitation comes from the lack of reliable and efficient surface metrology with required accuracy and with reasonably high measurement rate, suitable for integration into the modern deterministic surface figuring processes. The major problems of current surface metrology relate to the inherent instrumental temporal drifts, systematic errors, and/or an unacceptably high cost, as in the case of interferometry with computer-generated holograms as a reference. In this paper, we discuss the experimental methods and approaches based on correlation analysis to the acquisition and processing of metrology data developed at the ALS X-Ray Optical Laboratory (XROL). Using an example of surface topography measurements of a state-of-the-art x-ray mirror performed at the XROL, we demonstrate the efficiency of combining the developed experimental correlation methods to the advanced optimal scanning strategy (AOSS) technique. This allows a significant improvement in the accuracy and capacity of the measurements via suppression of the instrumental low frequency noise, temporal drift, and systematic error in a single measurement run. Practically speaking, implementation of the AOSS technique leads to an increase of the measurement accuracy, as well as the capacity of ex situ metrology by a factor of about four. The developed method is general and applicable to a broad spectrum of high accuracy measurements.

  9. At-wavelength metrology of x-ray optics at Diamond Light Source

    Science.gov (United States)

    Wang, Hongchang; Berujon, Sebastien; Sutter, John; Alcock, Simon G.; Sawhney, Kawal

    2014-09-01

    Modern, third-generation synchrotron radiation sources provide coherent and extremely bright beams of X-ray radiation. The successful exploitation of such beams depends to a significant extent on imperfections and misalignment of the optics employed on the beamlines. This issue becomes even more critical with the increasing use of active optics, and the desire to achieve diffraction-limited and coherence-preserving X-ray beams. In recent years, significant progress has been made to improve optic testing and optimization techniques, especially those using X-rays for so-called atwavelength metrology. These in-situ and at-wavelength metrology methods can be used not only to optimize the performance of X-ray optics, but also to correct and minimize the collective distortions of upstream beamline optics, including monochromators, and transmission windows. An overview of at-wavelength metrology techniques implemented at Diamond Light Source is presented, including grating interferometry and X-ray near-field speckle based techniques. Representative examples of the application of these techniques are also given, including in-situ and atwavelength calibration and optimization of: active, piezo bimorph mirrors; Kirkpatrick-Baez (KB) mirrors; and refractive optics such as compound refractive lenses.

  10. CONFERENCE NOTE: European Optical Society, Topical Meeting Optical Metrology and Nanotechnology, Engelberg, Switzerland, 27 30 March 1994

    Science.gov (United States)

    1993-01-01

    This meeting, organized by the Paul Scherrer Institute's Department of Applied Solid State Physics, will be held from 27 30 March 1994 at the Hotel Regina-Titlis, Engelberg, Switzerland. The aim is to bring together scientists from two important fields of current research and increasing industrial relevance. Optical metrology is a traditional discipline of applied optics which reached the nanometre scale a long time ago. Nanotechnology is setting new limits and represents a major challenge to metrology, as well as offering new opportunities to optics. The meeting is intended to help define a common future for optical metrology and nanotechnology. Topics to be covered include: nanometre position control and measuring techniques ultrahigh precision interferometry scanning probe microscopy (AFM, SNOM, etc.) surface modification by scanning probe methods precision surface fabrication and characterization nanolithography micro-optics, diffractive optics components, including systems and applications subwavelength optical structures synthetic optical materials structures and technologies for X-ray optics. For further information please contact: Jens Gobrecht (Secretary), Paul Scherrer Institute, CH-5232 Villigen-PSI, Switzerland.Tel. (41)56992529; Fax (41) 5698 2635.

  11. Measurement range of phase retrieval in optical surface and wavefront metrology

    International Nuclear Information System (INIS)

    Brady, Gregory R.; Fienup, James R.

    2009-01-01

    Phase retrieval employs very simple data collection hardware and iterative algorithms to determine the phase of an optical field. We have derived limitations on phase retrieval, as applied to optical surface and wavefront metrology, in terms of the speed of beam (i.e., f-number or numerical aperture) and amount of aberration using arguments based on sampling theory and geometrical optics. These limitations suggest methodologies for expanding these ranges by increasing the complexity of the measurement arrangement, the phase-retrieval algorithm, or both. We have simulated one of these methods where a surface is measured at unusual conjugates

  12. Radiation effects on optical components of a laser radar sensor designed for remote metrology in ITER

    International Nuclear Information System (INIS)

    Menon, M.M.; Grann, E.B.; Slotwinski, A.

    1997-09-01

    A frequency modulated laser radar is being developed for in-vessel metrology and viewing of plasma-facing surfaces. Some optical components of this sensor must withstand intense gamma radiation (3 x 10 6 rad/h) during operation. The authors have tested the effect of radiation on a silica core polarization maintaining optical fiber and on TeO 2 crystals at doses up to ∼ 10 9 rad. Additional tests are planned for evaluating the performance of a complete acousto-optic (AO) scanning device. The progress made in these tests is also described

  13. European Congress on Optics Applied to Metrology /METROP/, 2nd, Strasbourg, France, November 26-30, 1979, Proceedings

    International Nuclear Information System (INIS)

    Grosmann, M.; Meyrueis, P.

    1980-01-01

    The paper deals with speckle metrology, advances in classical optical metrology and measurement, and holographic metrology. Specific topics include hybrid holographic computer image processing, a speckle method of flow velocity measurement, the measurement of vibratory strains on turbine blades by speckle photography, the use of optical heterodyning and the Doppler effect in laser vibrometers and anemometers, subpicosecond dye lasers for optical metrology, and laser-beam scanning for remote control. Holographic interferometry of brittle materials is discussed, along with a system for the automatic analysis of holographic interferograms, the measurement of surface tension by holographic interferometry, nondestructive testing by means of holographic interferometry, real-time holographic interferometry of heat transfer at the surface of cold solar collectors, and the effective practical use of holography and related technologies in industry

  14. Scatterometry on pelliclized masks: an option for wafer fabs

    Science.gov (United States)

    Gallagher, Emily; Benson, Craig; Higuchi, Masaru; Okumoto, Yasuhiro; Kwon, Michael; Yedur, Sanjay; Li, Shifang; Lee, Sangbong; Tabet, Milad

    2007-03-01

    Optical scatterometry-based metrology is now widely used in wafer fabs for lithography, etch, and CMP applications. This acceptance of a new metrology method occurred despite the abundance of wellestablished CD-SEM and AFM methods. It was driven by the desire to make measurements faster and with a lower cost of ownership. Over the last year, scatterometry has also been introduced in advanced mask shops for mask measurements. Binary and phase shift masks have been successfully measured at all desired points during photomask production before the pellicle is mounted. There is a significant benefit to measuring masks with the pellicle in place. From the wafer fab's perspective, through-pellicle metrology would verify mask effects on the same features that are characterized on wafer. On-site mask verification would enable quality control and trouble-shooting without returning the mask to a mask house. Another potential application is monitoring changes to mask films once the mask has been delivered to the fab (haze, oxide growth, etc.). Similar opportunities apply to the mask metrologist receiving line returns from a wafer fab. The ability to make line-return measurements without risking defect introduction is clearly attractive. This paper will evaluate the feasibility of collecting scatterometry data on pelliclized masks. We explore the effects of several different pellicle types on scatterometry measurements made with broadband light in the range of 320-780 nm. The complexity introduced by the pellicles' optical behavior will be studied.

  15. First international conference on vibration control in optics and metrology

    International Nuclear Information System (INIS)

    Baker, L.R.

    1987-01-01

    This book contains 27 selections. Some of the titles are: Use of optics for vibration analysis of automotive components; Use of pulsed lasers for vibration analysis in the nuclear power industry; Vibration analysis of photocopiers; Control of ground vibrations; Design of low-vibration buildings: two case histories; and Continuous pulsed electronic speckle pattern interferometry

  16. Quantum cascade lasers as metrological tools for space optics

    Science.gov (United States)

    Bartalini, S.; Borri, S.; Galli, I.; Mazzotti, D.; Cancio Pastor, P.; Giusfredi, G.; De Natale, P.

    2017-11-01

    A distributed-feedback quantum-cascade laser working in the 4.3÷4.4 mm range has been frequency stabilized to the Lamb-dip center of a CO2 ro-vibrational transition by means of first-derivative locking to the saturated absorption signal, and its absolute frequency counted with a kHz-level precision and an overall uncertainty of 75 kHz. This has been made possible by an optical link between the QCL and a near-IR Optical Frequency Comb Synthesizer, thanks to a non-linear sum-frequency generation process with a fiber-amplified Nd:YAG laser. The implementation of a new spectroscopic technique, known as polarization spectroscopy, provides an improved signal for the locking loop, and will lead to a narrower laser emission and a drastic improvement in the frequency stability, that in principle is limited only by the stability of the optical frequency comb synthesizer (few parts in 1013). These results confirm quantum cascade lasers as reliable sources not only for high-sensitivity, but also for highprecision measurements, ranking them as optimal laser sources for space applications.

  17. Advanced X-ray Optics Metrology for Nanofocusing and Coherence Preservation

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Yashchuk, Valeriy

    2007-12-01

    What is the point of developing new high-brightness light sources if beamline optics won't be available to realize the goals of nano-focusing and coherence preservation? That was one of the central questions raised during a workshop at the 2007 Advanced Light Source Users Meeting. Titled, 'Advanced X-Ray Optics Metrology for Nano-focusing and Coherence Preservation', the workshop was organized by Kenneth Goldberg and Valeriy Yashchuk (both of Lawrence Berkeley National Laboratory, LBNL), and it brought together industry representatives and researchers from Japan, Europe, and the US to discuss the state of the art and to outline the optics requirements of new light sources. Many of the presentations are viewable on the workshop website http://goldberg.lbl.gov/MetrologyWorkshop07/. Many speakers shared the same view of one of the most significant challenges facing the development of new high-brightness third and fourth generation x-ray, soft x-ray, and EUV light sources: these sources place extremely high demands on the surface quality of beamline optics. In many cases, the 1-2-nm surface error specs that define the outer bounds of 'diffraction-limited' quality are beyond the reach of leading facilities and optics vendors. To focus light to 50-nm focal spots, or smaller, from reflective optics and to preserve the high coherent flux that new sources make possible, the optical surface quality and alignment tolerances must be measured in nano-meters and nano-radians. Without a significant, well-supported research effort, including the development of new metrology techniques for use both on and off the beamline, these goals will likely not be met. The scant attention this issue has garnered is evident in the stretched budgets and limited manpower currently dedicated to metrology. With many of the world's leading groups represented at the workshop, it became clear that Japan and Europe are several steps ahead of the US in this critical area

  18. SU-8 negative photoresist for optical mask manufacturing

    Science.gov (United States)

    Bogdanov, Alexei L.

    2000-06-01

    The requirements for better control, linearity, and uniformity of critical dimension (CD) on photomasks in fabrication of 180 and 150 nm generation devices result in increasing demand for thinner, more etching durable, and more sensitive e-beam resists. Novolac based resists with chemical amplification have been a choice for their sensitivity and stability during etching. However, difficult CD control due to the acid catalyzer diffusion and quite narrow post exposure bake (PEB) process window are some of the major drawbacks of these resists. SU-8 is recently introduced to the market negative photoresist. High sensitivity, fairly good adhesion properties, and relatively simple processing of SU-8 make it a good substitution for novolac based chemically amplified negative e-beam resists in optical mask manufacturing. The replacement of traditional chemically amplified resists by SU- 8 can increase the process latitude and reduce resist costs. Among the obvious drawbacks of SU-8 are the use of solvent- based developer and demand of oxygen plasma for resist removal. In this paper the use of SU-8 for optical mask manufacturing is reported. All steps of resist film preparation, exposure and development are paid a share of attention. Possibilities to use reactive ion etching (RIE) with oxygen in order to increase resist mask contrast are discussed. Special exposure strategy (pattern outlining) was employed to further improve the edge definition. The resist PEB temperature and time were studied to estimate their weight in overall CD control performance. Specially designed test patterns with 0.25 micrometer design rule could be firmly transferred into a chromium layer both by wet etching and ion milling. Influence of exposure dose variation on the pattern CD change was studied.

  19. Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory

    International Nuclear Information System (INIS)

    Advanced Light Source; Yashchuk, Valeriy V; Kirschman, Jonathan L.; Domning, Edward E.; McKinney, Wayne R.; Morrison, Gregory Y.; Smith, Brian V.; Yashchuk, Valeriy V.

    2008-01-01

    The next generation of synchrotrons and free electron laser facilities requires x-ray optical systems with extremely high performance, generally of diffraction limited quality. Fabrication and use of such optics requires adequate, highly accurate metrology and dedicated instrumentation. Previously, we suggested ways to improve the performance of the Long Trace Profiler (LTP), a slope measuring instrument widely used to characterize x-ray optics at long spatial wavelengths. The main way is use of a CCD detector and corresponding technique for calibration of photo-response non-uniformity [J. L. Kirschman, et al., Proceedings of SPIE 6704, 67040J (2007)]. The present work focuses on the performance and characteristics of the upgraded LTP-II at the ALS Optical Metrology Laboratory. This includes a review of the overall aspects of the design, control system, the movement and measurement regimes for the stage, and analysis of the performance by a slope measurement of a highly curved super-quality substrate with less than 0.3 microradian (rms)slope variation

  20. Optical metrology alignment and impact on the measurement performance of the LISA Technology Package

    Energy Technology Data Exchange (ETDEWEB)

    Hirth, M; Fichter, W; Brandt, N; Gerardi, D [iFR, Universitaet Stuttgart, Pfaffenwaldring 7a, 70569 Stuttgart (Germany); Schleicher, A [Astrium GmbH, 88039 Friedrichshafen (Germany); Wanner, G, E-mail: marc.hirth@ifr.uni-stuttgart.d [Albert Einstein Institut, Callinstrasse 38, 30167 Hannover (Germany)

    2009-03-01

    Aside from LISA Pathfinder's top-level acceleration requirement, there is a stringent independent requirement for the accuracy of the optical metrology system. In case of a perfectly aligned metrology system (optical bench and test masses) it should rather be independent of residual displacement jitter due to control. However, this ideal case will not be achieved as mechanical tolerances and uncertainties lead to a direct impact of test mass and spacecraft displacement jitter on the optical measurement accuracy. In this paper, we present a strategy how to cover these effects for a systematic requirement breakdown. We use a simplified nonlinear geometrical model for the differential distance measurement of the test masses which is linearized and linked to the equations of motion for both the spacecraft and the two test masses. This leads from test mass relative displacement to a formulation in terms of applied force/torque and thus allows to distinguish the absolute motion of each of the three bodies. It further shows how motions in each degree of freedom couple linearly into the optical measurement via DC misalignments of the laser beam and the test masses. This finally allows for deriving requirements on the alignment accuracy of components and on permittable closed-loop acceleration noise. In the last part a budget for the expected measurement performance is compiled from simulations as no measurement data is available yet.

  1. Optical metrology alignment and impact on the measurement performance of the LISA Technology Package

    International Nuclear Information System (INIS)

    Hirth, M; Fichter, W; Brandt, N; Gerardi, D; Schleicher, A; Wanner, G

    2009-01-01

    Aside from LISA Pathfinder's top-level acceleration requirement, there is a stringent independent requirement for the accuracy of the optical metrology system. In case of a perfectly aligned metrology system (optical bench and test masses) it should rather be independent of residual displacement jitter due to control. However, this ideal case will not be achieved as mechanical tolerances and uncertainties lead to a direct impact of test mass and spacecraft displacement jitter on the optical measurement accuracy. In this paper, we present a strategy how to cover these effects for a systematic requirement breakdown. We use a simplified nonlinear geometrical model for the differential distance measurement of the test masses which is linearized and linked to the equations of motion for both the spacecraft and the two test masses. This leads from test mass relative displacement to a formulation in terms of applied force/torque and thus allows to distinguish the absolute motion of each of the three bodies. It further shows how motions in each degree of freedom couple linearly into the optical measurement via DC misalignments of the laser beam and the test masses. This finally allows for deriving requirements on the alignment accuracy of components and on permittable closed-loop acceleration noise. In the last part a budget for the expected measurement performance is compiled from simulations as no measurement data is available yet.

  2. Metrological characterization methods for confocal chromatic line sensors and optical topography sensors

    Science.gov (United States)

    Seppä, Jeremias; Niemelä, Karri; Lassila, Antti

    2018-05-01

    The increasing use of chromatic confocal technology for, e.g. fast, in-line optical topography, and measuring thickness, roughness and profiles implies a need for the characterization of various aspects of the sensors. Single-point, line and matrix versions of chromatic confocal technology, encoding depth information into wavelength, have been developed. Of these, line sensors are particularly suitable for in-line process measurement. Metrological characterization and development of practical methods for calibration and checking is needed for new optical methods and devices. Compared to, e.g. tactile methods, optical topography measurement techniques have limitations related to light wavelength and coherence, optical properties of the sample including reflectivity, specularity, roughness and colour, and definition of optical versus mechanical surfaces. In this work, metrological characterization methods for optical line sensors were developed for scale magnification and linearity, sensitivity to sample properties, and dynamic characteristics. An accurate depth scale calibration method using a single prototype groove depth sample was developed for a line sensor and validated with laser-interferometric sample tracking, attaining (sub)micrometre level or better than 0.1% scale accuracy. Furthermore, the effect of different surfaces and materials on the measurement and depth scale was studied, in particular slope angle, specularity and colour. In addition, dynamic performance, noise, lateral scale and resolution were measured using the developed methods. In the case of the LCI1200 sensor used in this study, which has a 11.3 mm  ×  2.8 mm measurement range, the instrument depth scale was found to depend only minimally on sample colour, whereas measuring steeply sloped specular surfaces in the peripheral measurement area, in the worst case, caused a somewhat larger relative sample-dependent change (1%) in scale.

  3. Accuracy and performance of 3D mask models in optical projection lithography

    Science.gov (United States)

    Agudelo, Viviana; Evanschitzky, Peter; Erdmann, Andreas; Fühner, Tim; Shao, Feng; Limmer, Steffen; Fey, Dietmar

    2011-04-01

    Different mask models have been compared: rigorous electromagnetic field (EMF) modeling, rigorous EMF modeling with decomposition techniques and the thin mask approach (Kirchhoff approach) to simulate optical diffraction from different mask patterns in projection systems for lithography. In addition, each rigorous model was tested for two different formulations for partially coherent imaging: The Hopkins assumption and rigorous simulation of mask diffraction orders for multiple illumination angles. The aim of this work is to closely approximate results of the rigorous EMF method by the thin mask model enhanced with pupil filtering techniques. The validity of this approach for different feature sizes, shapes and illumination conditions is investigated.

  4. In-situ virtual metrology for the silicon-dioxide etch rate by using optical emission spectroscopy data

    International Nuclear Information System (INIS)

    Kim, Boomsoo; Hong, Sangjeen

    2014-01-01

    As a useful tool for process control in a high volume semiconductor manufacturing environment, virtual metrology for the etch rate in a plasma etch process is investigated using optical emission spectroscopy (OES) data. Virtual metrology is a surrogate measurement taken from the process instead of from direct measurement, and it can provide in-situ metrology of a wafer's geometry from a predictive model. A statistical regression model that correlates the selected wavelengths of the optical emission spectra to the etch rate is established using the OES data collected over 20 experimental runs. In addition, an argon actinometry study is employed to quantify the OES data, and it provides valuable insight into the analysis of the OES data. The established virtual metrology model is further verified with an additional 20 runs of data. As a result, the virtual metrology model with both process recipe tool data and in-situ data shows higher prediction accuracy by as much as 56% compared with either the process recipe tool data or the in-situ data alone.

  5. Improving the surface metrology accuracy of optical profilers by using multiple measurements

    Science.gov (United States)

    Xu, Xudong; Huang, Qiushi; Shen, Zhengxiang; Wang, Zhanshan

    2016-10-01

    The performance of high-resolution optical systems is affected by small angle scattering at the mid-spatial-frequency irregularities of the optical surface. Characterizing these irregularities is, therefore, important. However, surface measurements obtained with optical profilers are influenced by additive white noise, as indicated by the heavy-tail effect observable on their power spectral density (PSD). A multiple-measurement method is used to reduce the effects of white noise by averaging individual measurements. The intensity of white noise is determined using a model based on the theoretical PSD of fractal surface measurements with additive white noise. The intensity of white noise decreases as the number of times of multiple measurements increases. Using multiple measurements also increases the highest observed spatial frequency; this increase is derived and calculated. Additionally, the accuracy obtained using multiple measurements is carefully studied, with the analysis of both the residual reference error after calibration, and the random errors appearing in the range of measured spatial frequencies. The resulting insights on the effects of white noise in optical profiler measurements and the methods to mitigate them may prove invaluable to improve the quality of surface metrology with optical profilers.

  6. Editorial: 3DIM-DS 2015: Optical image processing in the context of 3D imaging, metrology, and data security

    Science.gov (United States)

    Alfalou, Ayman

    2017-02-01

    Following the first International Symposium on 3D Imaging, Metrology, and Data Security (3DIM-DS) held in Shenzhen during september 2015, this special issue gathers a series of articles dealing with the main topics discussed during this symposium. These topics highlighted the importance of studying complex data treatment systems and intensive calculations designed for high dimensional imaging and metrology for which high image quality and high transmission speed become critical issues in a number of technological applications. A second purpose was to celebrate the International Year of Light by emphasizing the important role of optics in actual information processing systems.

  7. Towards a Uniform Metrological Assessment of Grating-Based Optical Fiber Sensors: From Refractometers to Biosensors.

    Science.gov (United States)

    Chiavaioli, Francesco; Gouveia, Carlos A J; Jorge, Pedro A S; Baldini, Francesco

    2017-06-21

    A metrological assessment of grating-based optical fiber sensors is proposed with the aim of providing an objective evaluation of the performance of this sensor category. Attention was focused on the most common parameters, used to describe the performance of both optical refractometers and biosensors, which encompassed sensitivity, with a distinction between volume or bulk sensitivity and surface sensitivity, resolution, response time, limit of detection, specificity (or selectivity), reusability (or regenerability) and some other parameters of generic interest, such as measurement uncertainty, accuracy, precision, stability, drift, repeatability and reproducibility. Clearly, the concepts discussed here can also be applied to any resonance-based sensor, thus providing the basis for an easier and direct performance comparison of a great number of sensors published in the literature up to now. In addition, common mistakes present in the literature made for the evaluation of sensor performance are highlighted, and lastly a uniform performance assessment is discussed and provided. Finally, some design strategies will be proposed to develop a grating-based optical fiber sensing scheme with improved performance.

  8. Laser damage in optical components: metrology, statistical and photo-induced analysis of precursor centres

    International Nuclear Information System (INIS)

    Gallais, L.

    2002-11-01

    This thesis deals with laser damage phenomena for nanosecond pulses, in optical components such as glasses, dielectric and metallic thin films. Firstly, a work is done on the laser damage metrology, in order to obtain accurate and reliable measurement of laser-induced damage probabilities, with a rigorous control of test parameters. Then, with the use of a specific model, we find densities of laser damage precursors in the case of bulk glasses (few tens by (100μm) 3 ) and in the case of glass surfaces (one precursor by μm 3 ). Our analysis is associated to morphology studies by Atomic Force Microscope to discuss about precursor nature and damage process. Influence of wavelength (from 355 to 1064 nm) and cumulated shots is also studied. Simulations are performed to study initiation mechanisms on these inclusions. This work gives an estimation of complex index and size of the precursor, which permits to discuss about possible detection by non-destructive tools. (author)

  9. Optical metrology for analysis of lobster-eye x-ray optics

    International Nuclear Information System (INIS)

    Irving, Thomas H.K.; Peele, Andrew G.; Nugent, Keith A.

    2003-01-01

    A new method that uses optical microscopy to determine the physical structure of lobster-eye x-ray optics is described. This approach offers the ability to predict x-ray performance without having to take an x-ray measurement. An overlapping series of images of the entrance and exit faces of an optic are obtained and examined by purpose-built software. A 24-parameter description of each channel is obtained from which a quantitative analysis of all the major optic defects, except surface roughness, is performed. Results for a planar lobster-eye optic are used to illustrate this technique and discuss its abilities as well as directions for future enhancements

  10. INNOVATIVE NON-CONTACT METROLOGY SOLUTIONS FOR LARGE OPTICAL TELESCOPES, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — NASA has unique non-contact precision metrology requirements for dimensionally inspecting the global position and orientation of large and highly-polished...

  11. Coherent Laser Radar Metrology System for Large Scale Optical Systems, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — A new type of laser radar metrology inspection system is proposed that incorporates a novel, dual laser coherent detection scheme capable of eliminating both...

  12. High Performance Computing-Accelerated Metrology for Large Optical Telescopes, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — NASA has unique non-contact precision metrology requirements for dimensionally inspecting the global position and orientation of large and highly-polished...

  13. Comparison of cloud optical depth and cloud mask applying BRDF model-based background surface reflectance

    Science.gov (United States)

    Kim, H. W.; Yeom, J. M.; Woo, S. H.

    2017-12-01

    Over the thin cloud region, satellite can simultaneously detect the reflectance from thin clouds and land surface. Since the mixed reflectance is not the exact cloud information, the background surface reflectance should be eliminated to accurately distinguish thin cloud such as cirrus. In the previous research, Kim et al (2017) was developed the cloud masking algorithm using the Geostationary Ocean Color Imager (GOCI), which is one of significant instruments for Communication, Ocean, and Meteorology Satellite (COMS). Although GOCI has 8 spectral channels including visible and near infra-red spectral ranges, the cloud masking has quantitatively reasonable result when comparing with MODIS cloud mask (Collection 6 MYD35). Especially, we noticed that this cloud masking algorithm is more specialized in thin cloud detections through the validation with Cloud-Aerosol Lidar and Infrared Pathfinder Satellite Observation (CALIPSO) data. Because this cloud masking method was concentrated on eliminating background surface effects from the top-of-atmosphere (TOA) reflectance. Applying the difference between TOA reflectance and the bi-directional reflectance distribution function (BRDF) model-based background surface reflectance, cloud areas both thick cloud and thin cloud can be discriminated without infra-red channels which were mostly used for detecting clouds. Moreover, when the cloud mask result was utilized as the input data when simulating BRDF model and the optimized BRDF model-based surface reflectance was used for the optimized cloud masking, the probability of detection (POD) has higher value than POD of the original cloud mask. In this study, we examine the correlation between cloud optical depth (COD) and its cloud mask result. Cloud optical depths mostly depend on the cloud thickness, the characteristic of contents, and the size of cloud contents. COD ranges from less than 0.1 for thin clouds to over 1000 for the huge cumulus due to scattering by droplets. With

  14. Laboratory demonstration of an optical vortex mask coronagraph using photonic crystal

    Science.gov (United States)

    Murakami, N.; Baba, N.; Ise, A.; Sakamoto, M.; Oka, K.

    2010-10-01

    Photonic crystal, artificial periodic nanostructure, is an attractive device for constructing focal-plane phase-mask coronagraphs such as segmented phase masks (four-quadrant, eight-octant, and 4N-segmented ones) and an optical vortex mask (OVM), because of its extremely small manufacturing defect. Recently, speckle-noise limited contrast has been demonstrated for two monochromatic lasers by using the eight-octant phase-mask made of the photonic crystal (Murakami et al. 2010, ApJ, 714, 772). We applied the photonic-crystal device to the OVM coronagraph. The OVM is more advantageous over the segmented phase masks because it does not have discontinuities other than a central singular point and provides a full on-sky field of view. For generating an achromatic optical vortex, we manufactured an axially-symmetric half-wave plate (ASHWP). It is expected that a size of the manufacturing defect due to the central singularity is an order of several hundreds nanometers. The ASHWP is placed between two circular polarizers for modulating a Pancharatnam phase. A continuous spiral phase modulation is then implemented achromatically. We carried out preliminary laboratory demonstration of the OVM coronagraph using two monochromatic lasers as a model star (wavelengths of 532 nm and 633 nm). We report a principle of the achromatic optical-vortex generation, and results of the laboratory demonstration of the OVM coronagraph.

  15. The end-to-end testbed of the optical metrology system on-board LISA Pathfinder

    Energy Technology Data Exchange (ETDEWEB)

    Steier, F; Cervantes, F Guzman; Marin, A F GarcIa; Heinzel, G; Danzmann, K [Max-Planck-Institut fuer Gravitationsphysik (Albert-Einstein-Institut) and Universitaet Hannover (Germany); Gerardi, D, E-mail: frank.steier@aei.mpg.d [EADS Astrium Satellites GmbH, Friedrichshafen (Germany)

    2009-05-07

    LISA Pathfinder is a technology demonstration mission for the Laser Interferometer Space Antenna (LISA). The main experiment on-board LISA Pathfinder is the so-called LISA Technology Package (LTP) which has the aim to measure the differential acceleration between two free-falling test masses with an accuracy of 3 x 10{sup -14} ms{sup -2} Hz{sup -1/2} between 1 mHz and 30 mHz. This measurement is performed interferometrically by the optical metrology system (OMS) on-board LISA Pathfinder. In this paper, we present the development of an experimental end-to-end testbed of the entire OMS. It includes the interferometer and its sub-units, the interferometer backend which is a phasemeter and the processing of the phasemeter output data. Furthermore, three-axes piezo-actuated mirrors are used instead of the free-falling test masses for the characterization of the dynamic behaviour of the system and some parts of the drag-free and attitude control system (DFACS) which controls the test masses and the satellite. The end-to-end testbed includes all parts of the LTP that can reasonably be tested on earth without free-falling test masses. At its present status it consists mainly of breadboard components. Some of those have already been replaced by engineering models of the LTP experiment. In the next steps, further engineering and flight models will also be inserted in this testbed and tested against well-characterized breadboard components. The presented testbed is an important reference for the unit tests and can also be used for validation of the on-board experiment during the mission.

  16. Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance

    Science.gov (United States)

    Dietze, Uwe; Dress, Peter; Waehler, Tobias; Singh, Sherjang; Jonckheere, Rik; Baudemprez, Bart

    2011-03-01

    Extreme Ultraviolet Lithography (EUVL) is considered the leading lithography technology choice for semiconductor devices at 16nm HP node and beyond. However, before EUV Lithography can enter into High Volume Manufacturing (HVM) of advanced semiconductor devices, the ability to guarantee mask integrity at point-of-exposure must be established. Highly efficient, damage free mask cleaning plays a critical role during the mask manufacturing cycle and throughout the life of the mask, where the absence of a pellicle to protect the EUV mask increases the risk of contamination during storage, handling and use. In this paper, we will present effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance, which employs an intelligent, holistic approach to maximize Mean Time Between Cleans (MBTC) and extend the useful life span of the reticle. The data presented will demonstrate the protection of the capping and absorber layers, preservation of pattern integrity as well as optical and mechanical properties to avoid unpredictable CD-linewidth and overlay shifts. Experiments were performed on EUV blanks and pattern masks using various process conditions. Conditions showing high particle removal efficiency (PRE) and minimum surface layer impact were then selected for durability studies. Surface layer impact was evaluated over multiple cleaning cycles by means of UV reflectivity metrology XPS analysis and wafer prints. Experimental results were compared to computational models. Mask life time predictions where made using the same computational models. The paper will provide a generic overview of the cleaning sequence which yielded best results, but will also provide recommendations for an efficient in-fab mask maintenance scheme, addressing handling, storage, cleaning and inspection.

  17. Image-based overlay and alignment metrology through optically opaque media with sub-surface probe microscopy

    Science.gov (United States)

    van Es, Maarten H.; Mohtashami, Abbas; Piras, Daniele; Sadeghian, Hamed

    2018-03-01

    Nondestructive subsurface nanoimaging through optically opaque media is considered to be extremely challenging and is essential for several semiconductor metrology applications including overlay and alignment and buried void and defect characterization. The current key challenge in overlay and alignment is the measurement of targets that are covered by optically opaque layers. Moreover, with the device dimensions moving to the smaller nodes and the issue of the so-called loading effect causing offsets between between targets and product features, it is increasingly desirable to perform alignment and overlay on product features or so-called on-cell overlay, which requires higher lateral resolution than optical methods can provide. Our recently developed technique known as SubSurface Ultrasonic Resonance Force Microscopy (SSURFM) has shown the capability for high-resolution imaging of structures below a surface based on (visco-)elasticity of the constituent materials and as such is a promising technique to perform overlay and alignment with high resolution in upcoming production nodes. In this paper, we describe the developed SSURFM technique and the experimental results on imaging buried features through various layers and the ability to detect objects with resolution below 10 nm. In summary, the experimental results show that the SSURFM is a potential solution for on-cell overlay and alignment as well as detecting buried defects or voids and generally metrology through optically opaque layers.

  18. Dimensional metrology of lab-on-a-chip internal structures: a comparison of optical coherence tomography with confocal fluorescence microscopy.

    Science.gov (United States)

    Reyes, D R; Halter, M; Hwang, J

    2015-07-01

    The characterization of internal structures in a polymeric microfluidic device, especially of a final product, will require a different set of optical metrology tools than those traditionally used for microelectronic devices. We demonstrate that optical coherence tomography (OCT) imaging is a promising technique to characterize the internal structures of poly(methyl methacrylate) devices where the subsurface structures often cannot be imaged by conventional wide field optical microscopy. The structural details of channels in the devices were imaged with OCT and analyzed with an in-house written ImageJ macro in an effort to identify the structural details of the channel. The dimensional values obtained with OCT were compared with laser-scanning confocal microscopy images of channels filled with a fluorophore solution. Attempts were also made using confocal reflectance and interferometry microscopy to measure the channel dimensions, but artefacts present in the images precluded quantitative analysis. OCT provided the most accurate estimates for the channel height based on an analysis of optical micrographs obtained after destructively slicing the channel with a microtome. OCT may be a promising technique for the future of three-dimensional metrology of critical internal structures in lab-on-a-chip devices because scans can be performed rapidly and noninvasively prior to their use. © 2015 The Authors Journal of Microscopy © 2015 Royal Microscopical Society.

  19. Fabrication, performance, and figure metrology of epoxy-replicated aluminum foils for hard x-ray focusing multilayer-coated segmented conical optics

    DEFF Research Database (Denmark)

    Jimenez-Garate, M.A.; Craig, W.W.; Hailey, C.J.

    2000-01-01

    We fabricated x-ray mirrors for hard x-ray (greater than or equal to 10 keV) telescopes using multilayer coatings and an improved epoxy-replicated aluminum foil (ERAF) nonvacuum technology. The ERAF optics have similar to1 arcmin axial figure half-power diameter (HPD) and passed environmental...... telescope HPD, we designed a figure metrology system and a new mounting technique. We describe a cylindrical metrology system built for fast axial and roundness figure measurement of hard x-ray conical optics. These developments lower cost and improve the optics performance of the HEFT (high-energy focusing...

  20. Cryptographic analysis on the key space of optical phase encryption algorithm based on the design of discrete random phase mask

    Science.gov (United States)

    Lin, Chao; Shen, Xueju; Li, Zengyan

    2013-07-01

    The key space of phase encryption algorithm using discrete random phase mask is investigated by numerical simulation in this paper. Random phase mask with finite and discrete phase levels is considered as the core component in most practical optical encryption architectures. The key space analysis is based on the design criteria of discrete random phase mask. The role of random amplitude mask and random phase mask in optical encryption system is identified from the perspective of confusion and diffusion. The properties of discrete random phase mask in a practical double random phase encoding scheme working in both amplitude encoding (AE) and phase encoding (PE) modes are comparably analyzed. The key space of random phase encryption algorithm is evaluated considering both the encryption quality and the brute-force attack resistibility. A method for enlarging the key space of phase encryption algorithm is also proposed to enhance the security of optical phase encryption techniques.

  1. Coherent double-color interference microscope for traceable optical surface metrology

    Science.gov (United States)

    Malinovski, I.; França, R. S.; Bessa, M. S.; Silva, C. R.; Couceiro, I. B.

    2016-06-01

    Interference microscopy is an important field of dimensional surface metrology because it provides direct traceability of the measurements to the SI base unit definition of the metre. With a typical measurement range from micrometres to nanometres interference microscopy (IM) covers the gap between classic metrology and nanometrology, providing continuous transfer of dimensional metrology into new areas of nanoscience and nanotechnology. Therefore IM is considered to be an indispensable tool for traceable transfer of the metre unit to different instruments. We report here the metrological study of an absolute Linnik interference microscope (IM) based on two frequency stabilized lasers. The design permits the flexible use of both lasers for measurements depending on the demand of the concrete measurement task. By principle of operation IM is combination of imaging and phase-shifting interferometry (PSI). The traceability is provided by the wavelength reference, that is, a He-Ne 633 nm stabilized laser. The second laser source, that is, a Blue-Green 488 nm grating stabilized laser diode, is used for improvements of resolution, and also for resolving integer fringe discontinuities on sharp features of the surface. The IM was optimized for surface height metrology. We have performed the study of the systematic effects of the measurements. This study allowed us to improve the hardware and software of IM and to find corrections for main systematic errors. The IM is purposed for 1D to 3D height metrology and surface topography in an extended range from nanometres to micrometres. The advantages and disadvantages of the design and developed methods are discussed.

  2. Coherent double-color interference microscope for traceable optical surface metrology

    International Nuclear Information System (INIS)

    Malinovski, I; França, R S; Bessa, M S; Silva, C R; Couceiro, I B

    2016-01-01

    Interference microscopy is an important field of dimensional surface metrology because it provides direct traceability of the measurements to the SI base unit definition of the metre. With a typical measurement range from micrometres to nanometres interference microscopy (IM) covers the gap between classic metrology and nanometrology, providing continuous transfer of dimensional metrology into new areas of nanoscience and nanotechnology. Therefore IM is considered to be an indispensable tool for traceable transfer of the metre unit to different instruments. We report here the metrological study of an absolute Linnik interference microscope (IM) based on two frequency stabilized lasers. The design permits the flexible use of both lasers for measurements depending on the demand of the concrete measurement task. By principle of operation IM is combination of imaging and phase-shifting interferometry (PSI). The traceability is provided by the wavelength reference, that is, a He-Ne 633 nm stabilized laser. The second laser source, that is, a Blue-Green 488 nm grating stabilized laser diode, is used for improvements of resolution, and also for resolving integer fringe discontinuities on sharp features of the surface. The IM was optimized for surface height metrology. We have performed the study of the systematic effects of the measurements. This study allowed us to improve the hardware and software of IM and to find corrections for main systematic errors. The IM is purposed for 1D to 3D height metrology and surface topography in an extended range from nanometres to micrometres. The advantages and disadvantages of the design and developed methods are discussed. (paper)

  3. Reconstruction of mechanically recorded sound from an edison cylinder using three dimensional non-contact optical surface metrology

    Energy Technology Data Exchange (ETDEWEB)

    Fadeyev, V.; Haber, C.; Maul, C.; McBride, J.W.; Golden, M.

    2004-04-20

    Audio information stored in the undulations of grooves in a medium such as a phonograph disc record or cylinder may be reconstructed, without contact, by measuring the groove shape using precision optical metrology methods and digital image processing. The viability of this approach was recently demonstrated on a 78 rpm shellac disc using two dimensional image acquisition and analysis methods. The present work reports the first three dimensional reconstruction of mechanically recorded sound. The source material, a celluloid cylinder, was scanned using color coded confocal microscopy techniques and resulted in a faithful playback of the recorded information.

  4. Realizing "value-added" metrology

    Science.gov (United States)

    Bunday, Benjamin; Lipscomb, Pete; Allgair, John; Patel, Dilip; Caldwell, Mark; Solecky, Eric; Archie, Chas; Morningstar, Jennifer; Rice, Bryan J.; Singh, Bhanwar; Cain, Jason; Emami, Iraj; Banke, Bill, Jr.; Herrera, Alfredo; Ukraintsev, Vladamir; Schlessinger, Jerry; Ritchison, Jeff

    2007-03-01

    The conventional premise that metrology is a "non-value-added necessary evil" is a misleading and dangerous assertion, which must be viewed as obsolete thinking. Many metrology applications are key enablers to traditionally labeled "value-added" processing steps in lithography and etch, such that they can be considered integral parts of the processes. Various key trends in modern, state-of-the-art processing such as optical proximity correction (OPC), design for manufacturability (DFM), and advanced process control (APC) are based, at their hearts, on the assumption of fine-tuned metrology, in terms of uncertainty and accuracy. These trends are vehicles where metrology thus has large opportunities to create value through the engineering of tight and targetable process distributions. Such distributions make possible predictability in speed-sorts and in other parameters, which results in high-end product. Additionally, significant reliance has also been placed on defect metrology to predict, improve, and reduce yield variability. The necessary quality metrology is strongly influenced by not only the choice of equipment, but also the quality application of these tools in a production environment. The ultimate value added by metrology is a result of quality tools run by a quality metrology team using quality practices. This paper will explore the relationships among present and future trends and challenges in metrology, including equipment, key applications, and metrology deployment in the manufacturing flow. Of key importance are metrology personnel, with their expertise, practices, and metrics in achieving and maintaining the required level of metrology performance, including where precision, matching, and accuracy fit into these considerations. The value of metrology will be demonstrated to have shifted to "key enabler of large revenues," debunking the out-of-date premise that metrology is "non-value-added." Examples used will be from critical dimension (CD

  5. Extending CO2 cryogenic aerosol cleaning for advanced optical and EUV mask cleaning

    Science.gov (United States)

    Varghese, Ivin; Bowers, Charles W.; Balooch, Mehdi

    2011-11-01

    Cryogenic CO2 aerosol cleaning being a dry, chemically-inert and residue-free process is used in the production of optical lithography masks. It is an attractive cleaning option for the mask industry to achieve the requirement for removal of all printable soft defects and repair debris down to the 50nm printability specification. In the technique, CO2 clusters are formed by sudden expansion of liquid from high to almost atmospheric pressure through an optimally designed nozzle orifice. They are then directed on to the soft defects or debris for momentum transfer and subsequent damage free removal from the mask substrate. Unlike aggressive acid based wet cleaning, there is no degradation of the mask after processing with CO2, i.e., no critical dimension (CD) change, no transmission/phase losses, or chemical residue that leads to haze formation. Therefore no restriction on number of cleaning cycles is required to be imposed, unlike other cleaning methods. CO2 aerosol cleaning has been implemented for several years as full mask final clean in production environments at several state of the art mask shops. Over the last two years our group reported successful removal of all soft defects without damage to the fragile SRAF features, zero adders (from the cleaning and handling mechanisms) down to a 50nm printability specification. In addition, CO2 aerosol cleaning is being utilized to remove debris from Post-RAVE repair of hard defects in order to achieve the goal of no printable defects. It is expected that CO2 aerosol cleaning can be extended to extreme ultraviolet (EUV) masks. In this paper, we report advances being made in nozzle design qualification for optimum snow properties (size, velocity and flux) using Phase Doppler Anemometry (PDA) technique. In addition the two new areas of focus for CO2 aerosol cleaning i.e. pellicle glue residue removal on optical masks, and ruthenium (Ru) film on EUV masks are presented. Usually, the residue left over after the pellicle

  6. CONFERENCE NOTE: CETO—Centro de Ciências e Tecnologias Opticas, Trends in Optical Fibre Metrology and Standards

    Science.gov (United States)

    1994-01-01

    Summer School, 27 June to 8 July 1994, Viana do Castelo, Hotel do Parque, Portugal Optical fibres, with their extremely low transmission loss, untapped bandwidth and controllable dispersion, dominate a broad range of technologies in which applications must respond to the increasing constraints of today's specifications as well as envisage future requirements. Optical fibres dominate communications systems. In the area of sensors, fibre optics will be fully exploited for their immunity to EMI, their high sensitivity and their large dynamic range. The maturity of single mode optical technology has led to intensive R&D of a range of components based on the advantages of transmission characteristics and signal processing. Specifications and intercompatibility requests for the new generation of both analogue and digital fibre optical components and systems has created a demand for sophisticated measuring techniques based on unique and complex instruments. In recent years there has been a signification evolution in response to the explosion of applications and the tightening of specifications. These developments justify a concerted effort to focus on trends in optical fibre metrology and standards. Objective The objective of this school is to provide a progressive and comprehensive presentation of current issues concerning passive and active optical fibre characterization and measurement techniques. Passive fibre components support a variety of developments in optical fibre systems and will be discussed in terms of relevance and standards. Particular attention will be paid to devices for metrological purposes such as reference fibres and calibration artefacts. The characterization and testing of optical fibre amplifiers, which have great potential in telecommunications, data distribution networks and as a system part in instrumentation, will be covered. Methods of measurement and means of calibration with traceability will be discussed, together with the characterization

  7. Large-area parallel near-field optical nanopatterning of functional materials using microsphere mask

    Energy Technology Data Exchange (ETDEWEB)

    Chen, G.X. [NUS Nanoscience and Nanotechnology Initiative, National University of Singapore, 2 Engineering Drive 3, Singapore 117576 (Singapore); Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 (Singapore); Hong, M.H. [NUS Nanoscience and Nanotechnology Initiative, National University of Singapore, 2 Engineering Drive 3, Singapore 117576 (Singapore); Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 (Singapore); Data Storage Institute, ASTAR, DSI Building, 5 Engineering Drive 1, Singapore 117608 (Singapore)], E-mail: Hong_Minghui@dsi.a-star.edu.sg; Lin, Y. [NUS Nanoscience and Nanotechnology Initiative, National University of Singapore, 2 Engineering Drive 3, Singapore 117576 (Singapore); Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 (Singapore); Wang, Z.B. [Data Storage Institute, ASTAR, DSI Building, 5 Engineering Drive 1, Singapore 117608 (Singapore); Ng, D.K.T. [Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 (Singapore); Data Storage Institute, ASTAR, DSI Building, 5 Engineering Drive 1, Singapore 117608 (Singapore); Xie, Q. [Data Storage Institute, ASTAR, DSI Building, 5 Engineering Drive 1, Singapore 117608 (Singapore); Tan, L.S. [NUS Nanoscience and Nanotechnology Initiative, National University of Singapore, 2 Engineering Drive 3, Singapore 117576 (Singapore); Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 (Singapore); Chong, T.C. [Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 (Singapore); Data Storage Institute, ASTAR, DSI Building, 5 Engineering Drive 1, Singapore 117608 (Singapore)

    2008-01-31

    Large-area parallel near-field optical nanopatterning on functional material surfaces was investigated with KrF excimer laser irradiation. A monolayer of silicon dioxide microspheres was self-assembled on the sample surfaces as the processing mask. Nanoholes and nanospots were obtained on silicon surfaces and thin silver films, respectively. The nanopatterning results were affected by the refractive indices of the surrounding media. Near-field optical enhancement beneath the microspheres is the physical origin of nanostructure formation. Theoretical calculation was performed to study the intensity of optical field distributions under the microspheres according to the light scattering model of a sphere on the substrate.

  8. Use of KRS-XE positive chemically amplified resist for optical mask manufacturing

    Science.gov (United States)

    Ashe, Brian; Deverich, Christina; Rabidoux, Paul A.; Peck, Barbara; Petrillo, Karen E.; Angelopoulos, Marie; Huang, Wu-Song; Moreau, Wayne M.; Medeiros, David R.

    2002-03-01

    The traditional mask making process uses chain scission-type resists such as PBS, poly(butene-1-sulfone), and ZEP, poly(methyl a-chloroacrylate-co-a-methylstyrene) for making masks with dimensions greater than 180nm. PBS resist requires a wet etch process to produce patterns in chrome. ZEP was employed for dry etch processing to meet the requirements of shrinking dimensions, optical proximity corrections and phase shift masks. However, ZEP offers low contrast, marginal etch resistance, organic solvent development, and concerns regarding resist heating with its high dose requirements1. Chemically Amplified Resist (CAR) systems are a very good choice for dimensions less than 180nm because of their high sensitivity and contrast, high resolution, dry etch resistance, aqueous development, and process latitude2. KRS-XE was developed as a high contrast CA resist based on ketal protecting groups that eliminate the need for post exposure bake (PEB). This resist can be used for a variety of electron beam exposures, and improves the capability to fabricate masks for devices smaller than 180nm. Many factors influence the performance of resists in mask making such as post apply bake, exposure dose, resist develop, and post exposure bake. These items will be discussed as well as the use of reactive ion etching (RIE) selectivity and pattern transfer.

  9. Microlens array processor with programmable weight mask and direct optical input

    Science.gov (United States)

    Schmid, Volker R.; Lueder, Ernst H.; Bader, Gerhard; Maier, Gert; Siegordner, Jochen

    1999-03-01

    We present an optical feature extraction system with a microlens array processor. The system is suitable for online implementation of a variety of transforms such as the Walsh transform and DCT. Operating with incoherent light, our processor accepts direct optical input. Employing a sandwich- like architecture, we obtain a very compact design of the optical system. The key elements of the microlens array processor are a square array of 15 X 15 spherical microlenses on acrylic substrate and a spatial light modulator as transmissive mask. The light distribution behind the mask is imaged onto the pixels of a customized a-Si image sensor with adjustable gain. We obtain one output sample for each microlens image and its corresponding weight mask area as summation of the transmitted intensity within one sensor pixel. The resulting architecture is very compact and robust like a conventional camera lens while incorporating a high degree of parallelism. We successfully demonstrate a Walsh transform into the spatial frequency domain as well as the implementation of a discrete cosine transform with digitized gray values. We provide results showing the transformation performance for both synthetic image patterns and images of natural texture samples. The extracted frequency features are suitable for neural classification of the input image. Other transforms and correlations can be implemented in real-time allowing adaptive optical signal processing.

  10. Application of advanced diffraction based optical metrology overlay capabilities for high-volume manufacturing

    Science.gov (United States)

    Chen, Kai-Hsiung; Huang, Guo-Tsai; Hsieh, Hung-Chih; Ni, Wei-Feng; Chuang, S. M.; Chuang, T. K.; Ke, Chih-Ming; Huang, Jacky; Rao, Shiuan-An; Cumurcu Gysen, Aysegul; d'Alfonso, Maxime; Yueh, Jenny; Izikson, Pavel; Soco, Aileen; Wu, Jon; Nooitgedagt, Tjitte; Ottens, Jeroen; Kim, Yong Ho; Ebert, Martin

    2017-03-01

    On-product overlay requirements are becoming more challenging with every next technology node due to the continued decrease of the device dimensions and process tolerances. Therefore, current and future technology nodes require demanding metrology capabilities such as target designs that are robust towards process variations and high overlay measurement density (e.g. for higher order process corrections) to enable advanced process control solutions. The impact of advanced control solutions based on YieldStar overlay data is being presented in this paper. Multi patterning techniques are applied for critical layers and leading to additional overlay measurement demands. The use of 1D process steps results in the need of overlay measurements relative to more than one layer. Dealing with the increased number of overlay measurements while keeping the high measurement density and metrology accuracy at the same time presents a challenge for high volume manufacturing (HVM). These challenges are addressed by the capability to measure multi-layer targets with the recently introduced YieldStar metrology tool, YS350. On-product overlay results of such multi-layers and standard targets are presented including measurement stability performance.

  11. Digital chaos-masked optical encryption scheme enhanced by two-dimensional key space

    Science.gov (United States)

    Liu, Ling; Xiao, Shilin; Zhang, Lu; Bi, Meihua; Zhang, Yunhao; Fang, Jiafei; Hu, Weisheng

    2017-09-01

    A digital chaos-masked optical encryption scheme is proposed and demonstrated. The transmitted signal is completely masked by interference chaotic noise in both bandwidth and amplitude with analog method via dual-drive Mach-Zehnder modulator (DDMZM), making the encrypted signal analog, noise-like and unrecoverable by post-processing techniques. The decryption process requires precise matches of both the amplitude and phase between the cancellation and interference chaotic noises, which provide a large two-dimensional key space with the help of optical interference cancellation technology. For 10-Gb/s 16-quadrature amplitude modulation (QAM) orthogonal frequency division multiplexing (OFDM) signal over the maximum transmission distance of 80 km without dispersion compensation or inline amplifier, the tolerable mismatch ranges of amplitude and phase/delay at the forward error correction (FEC) threshold of 3.8×10-3 are 0.44 dB and 0.08 ns respectively.

  12. Optimized phase mask to realize retro-reflection reduction for optical systems

    Science.gov (United States)

    He, Sifeng; Gong, Mali

    2017-10-01

    Aiming at the threats to the active laser detection systems of electro-optical devices due to the cat-eye effect, a novel solution is put forward to realize retro-reflection reduction in this paper. According to the demands of both cat-eye effect reduction and the image quality maintenance of electro-optical devices, a symmetric phase mask is achieved from a stationary phase method and a fast Fourier transform algorithm. Then, based on a comparison of peak normalized cross-correlation (PNCC) between the different defocus parameters, the optimal imaging position can be obtained. After modification with the designed phase mask, the cat-eye effect peak intensity can be reduced by two orders of magnitude while maintaining good image quality and high modulation transfer function (MTF). Furthermore, a practical design example is introduced to demonstrate the feasibility of our proposed approach.

  13. Optical effects of shadow masks on short circuit current of organic photovoltaic devices.

    Science.gov (United States)

    Lin, Chi-Feng; Lin, Bing-Hong; Liu, Shun-Wei; Hsu, Wei-Feng; Zhang, Mi; Chiu, Tien-Lung; Wei, Mau-Kuo; Lee, Jiun-Haw

    2012-03-21

    In this paper, we have employed different shadow masks attached on top of organic photovoltaic (OPV) devices to study the optical effects of the former on the short circuit current (J(SC)). To rule out possible lateral electrical conduction and simplify the optical effects inside the device, a small-molecular heterojunction OPV device with a clear donor/acceptor interface was employed with a hole extraction layer exhibiting high resistance intentionally. Careful calibration with a shadow mask was employed. By attaching two layers of opaque masks in combination with a suitable holder design to shield the light from the edges and backside, the value of J(SC) approached that of the dark current, even under 1-sun radiation. With different illumination areas, we found that the photons illuminating the non-active region of the device contributed to 40% of the J(SC) by optical effect within the width of about 1 mm around the active region. When illuminating the non-active area with 12 mm to the active area, a 5.6 times improvement in the J(SC) was observed when the incident angle was 75°. With the introduction of a microstructured film onto the OPV device and an increase in the reflection from the non-active region, a 15% enhancement of the J(SC) compared to the control device was achieved.

  14. Enhancement of security using structured phase masked in optical image encryption on Fresnel transform domain

    Science.gov (United States)

    Yadav, Poonam Lata; Singh, Hukum

    2018-05-01

    To enhance the security in optical image encryption system and to protect it from the attackers, this paper proposes new digital spiral phase mask based on Fresnel Transform. In this cryptosystem the Spiral Phase Mask (SPM) used is a hybrid of Fresnel Zone Plate (FZP) and Radial Hilbert Mask (RHM) which makes the key strong and enhances the security. The different keys used for encryption and decryption purposed make the system much more secure. Proposed scheme uses various structured phase mask which increases the key space also it increases the number of parameters which makes it difficult for the attackers to exactly find the key to recover the original image. We have also used different keys for encryption and decryption purpose to make the system much more secure. The strength of the proposed cryptosystem has been analyzed by simulating on MATLAB 7.9.0(R2008a). Mean Square Errors (MSE) and Peak Signal to Noise Ratio (PSNR) are calculated for the proposed algorithm. The experimental results are provided to highlight the effectiveness and sustainability of proposed cryptosystem and to prove that the cryptosystem is secure for usage.

  15. Mounting for Fabrication, Metrology, and Assembly of Full Shell Grazing Incidence Optics

    Science.gov (United States)

    Roche, Jacqueline M.; Gubarev, Mikhail V.; O'Dell, Stephen L.; Kolodziejczak, Jeffery; Weisskopf, Martin C.; Ramsey, Brian D.; Elsner, Ronald F.

    2014-01-01

    Future x-ray telescopes will likely require lightweight mirrors to attain the large collecting areas needed to accomplish the science objectives. Understanding and demonstrating processes now is critical to achieving sub-arcsecond performance in the future. Consequently, designs not only of the mirrors but of fixtures for supporting them during fabrication, metrology, handling, assembly, and testing must be adequately modeled and verified. To this end, MSFC is using finite-element modeling to study the effects of mounting on full-shell grazing-incidence mirrors, during all processes leading to flight mirror assemblies. Here we report initial results of this study.

  16. Metrology Measurement Capabilities

    Energy Technology Data Exchange (ETDEWEB)

    Dr. Glen E. Gronniger

    2007-10-02

    This document contains descriptions of Federal Manufacturing & Technologies (FM&T) Metrology capabilities, traceability flow charts, and the measurement uncertainty of each measurement capability. Metrology provides NIST traceable precision measurements or equipment calibration for a wide variety of parameters, ranges, and state-of-the-art uncertainties. Metrology laboratories conform to the requirements of the Department of Energy Development and Production Manual Chapter 13.2, ANSI/ISO/IEC ANSI/ISO/IEC 17025:2005, and ANSI/NCSL Z540-1. FM&T Metrology laboratories are accredited by NVLAP for the parameters, ranges, and uncertainties listed in the specific scope of accreditation under NVLAP Lab code 200108-0. See the Internet at http://ts.nist.gov/Standards/scopes/2001080.pdf. These parameters are summarized. The Honeywell Federal Manufacturing & Technologies (FM&T) Metrology Department has developed measurement technology and calibration capability in four major fields of measurement: (1) Mechanical; (2) Environmental, Gas, Liquid; (3) Electrical (DC, AC, RF/Microwave); and (4) Optical and Radiation. Metrology Engineering provides the expertise to develop measurement capabilities for virtually any type of measurement in the fields listed above. A strong audit function has been developed to provide a means to evaluate the calibration programs of our suppliers and internal calibration organizations. Evaluation includes measurement audits and technical surveys.

  17. Poisson-Spot Intensity Reduction with a Partially-Transparent Petal-Shaped Optical Mask

    Science.gov (United States)

    Shiri, Shahram; Wasylkiwskyj, Wasyl

    2013-01-01

    The presence of Poisson's spot, also known as the spot of Arago, formed along the optical axis in the geometrical shadow behind an obstruction, has been known since the 18th century. The presence of this spot can best be described as the consequence of constructive interference of light waves diffracted on the edge of the obstruction where its central position can··be determined by the symmetry of the object More recently, the elimination of this spot has received attention in the fields of particle physics, high-energy lasers, astronomy and lithography. In this paper, we introduce a novel, partially transparent petaled mask shape that suppresses the bright spot by up to 10 orders of magnitude in intensity, with powerful applications to many of the above fields. The optimization technique formulated in this design can identify mask shapes having partial transparency only near the petal tips.

  18. FOREWORD: Materials metrology Materials metrology

    Science.gov (United States)

    Bennett, Seton; Valdés, Joaquin

    2010-04-01

    It seems that so much of modern life is defined by the materials we use. From aircraft to architecture, from cars to communications, from microelectronics to medicine, the development of new materials and the innovative application of existing ones have underpinned the technological advances that have transformed the way we live, work and play. Recognizing the need for a sound technical basis for drafting codes of practice and specifications for advanced materials, the governments of countries of the Economic Summit (G7) and the European Commission signed a Memorandum of Understanding in 1982 to establish the Versailles Project on Advanced Materials and Standards (VAMAS). This project supports international trade by enabling scientific collaboration as a precursor to the drafting of standards. The VAMAS participants recognized the importance of agreeing a reliable, universally accepted basis for the traceability of the measurements on which standards depend for their preparation and implementation. Seeing the need to involve the wider metrology community, VAMAS approached the Comité International des Poids et Mesures (CIPM). Following discussions with NMI Directors and a workshop at the BIPM in February 2005, the CIPM decided to establish an ad hoc Working Group on the metrology applicable to the measurement of material properties. The Working Group presented its conclusions to the CIPM in October 2007 and published its final report in 2008, leading to the signature of a Memorandum of Understanding between VAMAS and the BIPM. This MoU recognizes the work that is already going on in VAMAS as well as in the Consultative Committees of the CIPM and establishes a framework for an ongoing dialogue on issues of materials metrology. The question of what is meant by traceability in the metrology of the properties of materials is particularly vexed when the measurement results depend on a specified procedure. In these cases, confidence in results requires not only traceable

  19. Fundamental performance determining factors of the ultrahigh-precision space-borne optical metrology system for the LISA Pathfinder mission

    Science.gov (United States)

    Hechenblaikner, Gerald; Flatscher, Reinhold

    2013-05-01

    The LISA Pathfinder mission to space employs an optical metrology system (OMS) at its core to measure the distance and attitude between two freely floating test-masses to picometer and nanorad accuracy, respectively, within the measurement band of [1 mHz, 30 mHz]. The OMS is based upon an ultra-stable optical bench with 4 heterodyne interferometers from which interference signals are read-out and processed by a digital phase-meter. Laser frequency noise, power fluctuations and optical path-length variations are suppressed to uncritical levels by dedicated control loops so that the measurement performance approaches the sensor limit imposed by the phasemeter. The system design is such that low frequency common mode noise which affects the read-out phase of all four interferometers is generally well suppressed by subtraction of a reference phase from the other interferometer signals. However, high frequency noise directly affects measurement performance and its common mode rejection depends strongly on the relative signal phases. We discuss how the data from recent test campaigns point towards high frequency phase noise as a likely performance limiting factor which explains some important performance features.

  20. Metrology for Grayscale Lithography

    International Nuclear Information System (INIS)

    Murali, Raghunath

    2007-01-01

    Three dimensional microstructures find applications in diffractive optical elements, photonic elements, etc. and can be efficiently fabricated by grayscale lithography. Good process control is important for achieving the desired structures. Metrology methods for grayscale lithography are discussed. Process optimization for grayscale e-beam lithography is explored and various process parameters that affect the grayscale process are discussed

  1. Impulse attack-free four random phase mask encryption based on a 4-f optical system.

    Science.gov (United States)

    Kumar, Pramod; Joseph, Joby; Singh, Kehar

    2009-04-20

    Optical encryption methods based on double random phase encryption (DRPE) have been shown to be vulnerable to different types of attacks. The Fourier plane random phase mask (RPM), which is the most important key, can be cracked with a single impulse function attack. Such an attack is viable because the Fourier transform of a delta function is a unity function. Formation of a unity function can be avoided if RPMs are placed in front of both lenses in a 4-f optical setup, thereby protecting the DRPE from an impulse attack. We have performed numerical simulations to verify the proposed scheme. Resistance of this scheme is checked against the brute force and the impulse function attacks. The experimental results validate the feasibility of the scheme.

  2. Multi-scale optical metrology for the quality control of polymer microfluidic systems

    DEFF Research Database (Denmark)

    Tosello, Guido; Marinello, Francesco; Hansen, Hans Nørgaard

    2009-01-01

    Micro injection moulding is a replication technology enabling large scale production of polymer-based micro products. To this respect, optical measuring technologies were selected to perform the quality control of a polymer micro-component: an optical coordinate measuring machine (CMM) and a white...

  3. The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II

    Science.gov (United States)

    Schäfers, F.; Bischoff, P.; Eggenstein, F.; Erko, A.; Gaupp, A.; Künstner, S.; Mast, M.; Schmidt, J.-S.; Senf, F.; Siewert, F.; Sokolov, A.; Zeschke, Th.

    2016-01-01

    A technology center for the production of high-precision reflection gratings has been established. Within this project a new optics beamline and a versatile reflectometer for at-wavelength characterization of UV- and XUV-reflection gratings and other (nano-) optical elements has been set up at BESSY-II. The Plane Grating Monochromator beamline operated in collimated light (c-PGM) is equipped with an SX700 monochromator, of which the blazed gratings (600 and 1200 lines mm−1) have been recently exchanged for new ones of improved performance produced in-house. Over the operating range from 10 to 2000 eV this beamline has very high spectral purity achieved by (i) a four-mirror arrangement of different coatings which can be inserted into the beam at different angles and (ii) by absorber filters for high-order suppression. Stray light and scattered radiation is removed efficiently by double sets of in situ exchangeable apertures and slits. By use of in- and off-plane bending-magnet radiation the beamline can be adjusted to either linear or elliptical polarization. One of the main features of a novel 11-axes reflectometer is the possibility to incorporate real life-sized gratings. The samples are adjustable within six degrees of freedom by a newly developed UHV-tripod system carrying a load up to 4 kg, and the reflectivity can be measured between 0 and 90° incidence angle for both s- and p-polarization geometry. This novel powerful metrology facility has gone into operation recently and is now open for external users. First results on optical performance and measurements on multilayer gratings will be presented here. PMID:26698047

  4. High-Resolution Detector for At-Wavelength Metrology of X-Ray Optics, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — Since the launch of the first X-ray focusing telescope in 1963, the development of grazing incidence X-ray optics has been crucial to the development of the field of...

  5. High-Resolution Detector for At-Wavelength Metrology of X-Ray Optics, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — Since the launch of the first X-ray focusing telescope in 1963, the development of grazing incidence X-ray optics has been crucial to the development of the field of...

  6. Coupling of relative intensity noise and pathlength noise to the length measurement in the optical metrology system of LISA Pathfinder

    Science.gov (United States)

    Wittchen, Andreas; the LPF Collaboration

    2017-05-01

    LISA Pathfinder is a technology demonstration mission for the space-based gravitational wave observatory, LISA. It demonstrated that the performance requirements for the interferometric measurement of two test masses in free fall can be met. An important part of the data analysis is to identify the limiting noise sources. [1] This measurement is performed with heterodyne interferometry. The performance of this optical metrology system (OMS) at high frequencies is limited by sensing noise. One such noise source is Relative Intensity Noise (RIN). RIN is a property of the laser, and the photodiode current generated by the interferometer signal contains frequency dependant RIN. From this electric signal the phasemeter calculates the phase change and laser power, and the coupling of RIN into the measurement signal depends on the noise frequency. RIN at DC, at the heterodyne frequency and at two times the heterodyne frequency couples into the phase. Another important noise at high frequencies is path length noise. To reduce the impact this noise is suppressed with a control loop. Path length noise not suppressed will couple directly into the length measurement. The subtraction techniques of both noise sources depend on the phase difference between the reference signal and the measurement signal, and thus on the test mass position. During normal operations we position the test mass at the interferometric zero, which is optimal for noise subtraction purposes. This paper will show results from an in-flight experiment where the test mass position was changed to make the position dependant noise visible.

  7. Quantum metrology

    International Nuclear Information System (INIS)

    Xiang Guo-Yong; Guo Guang-Can

    2013-01-01

    The statistical error is ineluctable in any measurement. Quantum techniques, especially with the development of quantum information, can help us squeeze the statistical error and enhance the precision of measurement. In a quantum system, there are some quantum parameters, such as the quantum state, quantum operator, and quantum dimension, which have no classical counterparts. So quantum metrology deals with not only the traditional parameters, but also the quantum parameters. Quantum metrology includes two important parts: measuring the physical parameters with a precision beating the classical physics limit and measuring the quantum parameters precisely. In this review, we will introduce how quantum characters (e.g., squeezed state and quantum entanglement) yield a higher precision, what the research areas are scientists most interesting in, and what the development status of quantum metrology and its perspectives are. (topical review - quantum information)

  8. Gabor-domain optical coherence microscopy with integrated dual-axis MEMS scanner for fast 3D imaging and metrology

    Science.gov (United States)

    Canavesi, Cristina; Cogliati, Andrea; Hayes, Adam; Santhanam, Anand P.; Tankam, Patrice; Rolland, Jannick P.

    2015-10-01

    Fast, robust, nondestructive 3D imaging is needed for characterization of microscopic structures in industrial and clinical applications. A custom micro-electromechanical system (MEMS)-based 2D scanner system was developed to achieve 55 kHz A-scan acquisition in a Gabor-domain optical coherence microscopy (GD-OCM) instrument with a novel multilevel GPU architecture for high-speed imaging. GD-OCM yields high-definition volumetric imaging with dynamic depth of focusing through a bio-inspired liquid lens-based microscope design, which has no moving parts and is suitable for use in a manufacturing setting or in a medical environment. A dual-axis MEMS mirror was chosen to replace two single-axis galvanometer mirrors; as a result, the astigmatism caused by the mismatch between the optical pupil and the scanning location was eliminated and a 12x reduction in volume of the scanning system was achieved. Imaging at an invariant resolution of 2 μm was demonstrated throughout a volume of 1 × 1 × 0.6 mm3, acquired in less than 2 minutes. The MEMS-based scanner resulted in improved image quality, increased robustness and lighter weight of the system - all factors that are critical for on-field deployment. A custom integrated feedback system consisting of a laser diode and a position-sensing detector was developed to investigate the impact of the resonant frequency of the MEMS and the driving signal of the scanner on the movement of the mirror. Results on the metrology of manufactured materials and characterization of tissue samples with GD-OCM are presented.

  9. Optically secured information retrieval using two authenticated phase-only masks.

    Science.gov (United States)

    Wang, Xiaogang; Chen, Wen; Mei, Shengtao; Chen, Xudong

    2015-10-23

    We propose an algorithm for jointly designing two phase-only masks (POMs) that allow for the encryption and noise-free retrieval of triple images. The images required for optical retrieval are first stored in quick-response (QR) codes for noise-free retrieval and flexible readout. Two sparse POMs are respectively calculated from two different images used as references for authentication based on modified Gerchberg-Saxton algorithm (GSA) and pixel extraction, and are then used as support constraints in a modified double-phase retrieval algorithm (MPRA), together with the above-mentioned QR codes. No visible information about the target images or the reference images can be obtained from each of these authenticated POMs. This approach allows users to authenticate the two POMs used for image reconstruction without visual observation of the reference images. It also allows user to friendly access and readout with mobile devices.

  10. Generation of mask patterns for diffractive optical elements using MathematicaTM

    International Nuclear Information System (INIS)

    OShea, D.C.

    1996-01-01

    The generation of binary and grayscale masks used in the fabrication of diffractive optical elements is usually performed using a proprietary piece of software or a computer-aided drafting package. Once the pattern is computed or designed, it must be output to a plotting or imaging system that will produce a reticle plate. This article describes a number of short Mathematica modules that can be used to generate binary and grayscale patterns in a PostScript-compatible format. Approaches to ensure that the patterns are directly related to the function of the element and the design wavelength are discussed. A procedure to preserve the scale of the graphic output when it is transferred to another application is given. Examples of surfaces for a 100 mm effective focal length lens and an Alvarez surface are given. copyright 1996 American Institute of Physics

  11. Optical Metrology for CIGS Solar Cell Manufacturing and its Cost Implications

    Science.gov (United States)

    Sunkoju, Sravan Kumar

    Solar energy is a promising source of renewable energy which can meet the demand for clean energy in near future with advances in research in the field of photovoltaics and cost reduction by commercialization. Availability of a non-contact, in-line, real time robust process control strategies can greatly aid in reducing the gap between cell and module efficiencies, thereby leading to cost-effective large-scale manufacturing of high efficiency CIGS solar cells. In order to achieve proper process monitoring and control for the deposition of the functional layers of CuIn1-xGaxSe 2 (CIGS) based thin film solar cell, optical techniques such as spectroscopic reflectometry and polarimetry are advantageous because they can be set up in an unobtrusive manner in the manufacturing line, and collect data in-line and in-situ. The use of these techniques requires accurate optical models that correctly represent the properties of the layers being deposited. In this study, Spectroscopic ellipsometry (SE) has been applied for the characterization of each individual stage of CIGS layers deposited using the 3-stage co-evaporation process along with the other functional layers. Dielectric functions have been determined for the energy range from 0.7 eV to 5.1 eV. Critical-point line-shape analysis was used in this study to determine the critical point energies of the CIGS based layers. To control the compositional and thickness uniformity of all the functional layers during the fabrication of CIGS solar cells over large areas, multilayer photovoltaics (PV) stack optical models were developed with the help of extracted dielectric functions. In this study, mapping capability of RC2 spectroscopic ellipsometer was used to map all the functional layer thicknesses of a CIGS solar cell in order to probe the spatial non-uniformities that can affect the performance of a cell. The optical functions for each of the stages of CIGS 3-stage deposition process along with buffer layer and transparent

  12. Radioactivity metrology

    International Nuclear Information System (INIS)

    Legrand, J.

    1979-01-01

    Some aspects of the radioactivity metrology are reviewed. Radioactivity primary references; absolute methods of radioactivity measurements used in the Laboratoire de Metrologie des Rayonnements Ionisants; relative measurement methods; traceability through international comparisons and interlaboratory tests; production and distribution of secondary standards [fr

  13. Study of shape evaluation for mask and silicon using large field of view

    Science.gov (United States)

    Matsuoka, Ryoichi; Mito, Hiroaki; Shinoda, Shinichi; Toyoda, Yasutaka

    2010-09-01

    We have developed a highly integrated method of mask and silicon metrology. The aim of this integration is evaluating the performance of the silicon corresponding to Hotspot on a mask. It can use the mask shape of a large field, besides. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. Currently, as semiconductor manufacture moves towards even smaller feature size, this necessitates more aggressive optical proximity correction (OPC) to drive the super-resolution technology (RET). In other words, there is a trade-off between highly precise RET and mask manufacture, and this has a big impact on the semiconductor market that centers on the mask business. As an optimal solution to these issues, we provide a DFM solution that extracts 2-dimensional data for a more realistic and error-free simulation by reproducing accurately the contour of the actual mask, in addition to the simulation results from the mask data. On the other hand, there is roughness in the silicon form made from a mass-production line. Moreover, there is variation in the silicon form. For this reason, quantification of silicon form is important, in order to estimate the performance of a pattern. In order to quantify, the same form is equalized in two dimensions. And the method of evaluating based on the form is popular. In this study, we conducted experiments for averaging method of the pattern (Measurement Based Contouring) as two-dimensional mask and silicon evaluation technique. That is, observation of the identical position of a mask and a silicon was considered. The result proved its detection accuracy and reliability of variability on two-dimensional pattern (mask and silicon) and is adaptable to following fields of mask quality management. •Discrimination of nuisance defects for fine pattern. •Determination of two-dimensional variability of

  14. Full-field parallel interferometry coherence probe microscope for high-speed optical metrology.

    Science.gov (United States)

    Safrani, A; Abdulhalim, I

    2015-06-01

    Parallel detection of several achromatic phase-shifted images is used to obtain a high-speed, high-resolution, full-field, optical coherence probe tomography system based on polarization interferometry. The high enface imaging speed, short coherence gate, and high lateral resolution provided by the system are exploited to determine microbump height uniformity in an integrated semiconductor chip at 50 frames per second. The technique is demonstrated using the Linnik microscope, although it can be implemented on any polarization-based interference microscopy system.

  15. Joint Research on Scatterometry and AFM Wafer Metrology

    NARCIS (Netherlands)

    Bodermann, B.; Buhr, E.; Danzebrink, H.U.; Bär, M.; Scholze, F.; Krumrey, M.; Wurm, M.; Klapetek, P.; Hansen, P.E.; Korpelainen, V.; Van Veghel, M.; Yacoot, A.; Siitonen, S.; El Gawhary, O.; Burger, S.; Saastamoinen, T.

    2011-01-01

    Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both

  16. Binary phase masks on self-developing photopolymers: the technique for formation and testing in an optical correlator

    International Nuclear Information System (INIS)

    Yezhov, P V; Il'in, O A; Smirnova, T N; Tikhonov, E A

    2003-01-01

    Binary phase masks (PMs) of size 256x256 cells with a random distribution of elements, formed on the self-developing FPK-488 photopolymer, are studied. The masks were prepared by the projection method using amplitude transparencies. The phase shift between the mask elements corresponding to the regions of the amplitude transparency with the optical density D = 0 and 2 was (0.85±0.05)π at the wavelength of 0.633 μm. Holographic matched filters were recorded for PMs obtained. The diffraction efficiency of holographic matched PM filters was 40 %. The signal-to-noise ratio for recognition signals for PMs in the Vander Lugt correlator was 20 dB. The normalised power density of the recognition signal is studied as a function of the rotation angle of a PM in the input plane of the Vander Lugt correlator. (laser applications and other topics in quantum electronics)

  17. Temperature metrology

    Science.gov (United States)

    Fischer, J.; Fellmuth, B.

    2005-05-01

    The majority of the processes used by the manufacturing industry depend upon the accurate measurement and control of temperature. Thermal metrology is also a key factor affecting the efficiency and environmental impact of many high-energy industrial processes, the development of innovative products and the health and safety of the general population. Applications range from the processing, storage and shipment of perishable foodstuffs and biological materials to the development of more efficient and less environmentally polluting combustion processes for steel-making. Accurate measurement and control of temperature is, for instance, also important in areas such as the characterization of new materials used in the automotive, aerospace and semiconductor industries. This paper reviews the current status of temperature metrology. It starts with the determination of thermodynamic temperatures required on principle because temperature is an intensive quantity. Methods to determine thermodynamic temperatures are reviewed in detail to introduce the underlying physical basis. As these methods cannot usually be applied for practical measurements the need for a practical temperature scale for day-to-day work is motivated. The International Temperature Scale of 1990 and the Provisional Low Temperature Scale PLTS-2000 are described as important parts of the International System of Units to support science and technology. Its main importance becomes obvious in connection with industrial development and international markets. Every country is strongly interested in unique measures, in order to guarantee quality, reproducibility and functionability of products. The eventual realization of an international system, however, is only possible within the well-functioning organization of metrological laboratories. In developed countries the government established scientific institutes have certain metrological duties, as, for instance, the maintenance and dissemination of national

  18. Temperature metrology

    International Nuclear Information System (INIS)

    Fischer, J; Fellmuth, B

    2005-01-01

    The majority of the processes used by the manufacturing industry depend upon the accurate measurement and control of temperature. Thermal metrology is also a key factor affecting the efficiency and environmental impact of many high-energy industrial processes, the development of innovative products and the health and safety of the general population. Applications range from the processing, storage and shipment of perishable foodstuffs and biological materials to the development of more efficient and less environmentally polluting combustion processes for steel-making. Accurate measurement and control of temperature is, for instance, also important in areas such as the characterization of new materials used in the automotive, aerospace and semiconductor industries. This paper reviews the current status of temperature metrology. It starts with the determination of thermodynamic temperatures required on principle because temperature is an intensive quantity. Methods to determine thermodynamic temperatures are reviewed in detail to introduce the underlying physical basis. As these methods cannot usually be applied for practical measurements the need for a practical temperature scale for day-to-day work is motivated. The International Temperature Scale of 1990 and the Provisional Low Temperature Scale PLTS-2000 are described as important parts of the International System of Units to support science and technology. Its main importance becomes obvious in connection with industrial development and international markets. Every country is strongly interested in unique measures, in order to guarantee quality, reproducibility and functionability of products. The eventual realization of an international system, however, is only possible within the well-functioning organization of metrological laboratories. In developed countries the government established scientific institutes have certain metrological duties, as, for instance, the maintenance and dissemination of national

  19. Development for 2D pattern quantification method on mask and wafer

    Science.gov (United States)

    Matsuoka, Ryoichi; Mito, Hiroaki; Toyoda, Yasutaka; Wang, Zhigang

    2010-03-01

    We have developed the effective method of mask and silicon 2-dimensional metrology. The aim of this method is evaluating the performance of the silicon corresponding to Hotspot on a mask. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. Currently, as semiconductor manufacture moves towards even smaller feature size, this necessitates more aggressive optical proximity correction (OPC) to drive the super-resolution technology (RET). In other words, there is a trade-off between highly precise RET and mask manufacture, and this has a big impact on the semiconductor market that centers on the mask business. 2-dimensional Shape quantification is important as optimal solution over these problems. Although 1-dimensional shape measurement has been performed by the conventional technique, 2-dimensional shape management is needed in the mass production line under the influence of RET. We developed the technique of analyzing distribution of shape edge performance as the shape management technique. On the other hand, there is roughness in the silicon shape made from a mass-production line. Moreover, there is variation in the silicon shape. For this reason, quantification of silicon shape is important, in order to estimate the performance of a pattern. In order to quantify, the same shape is equalized in two dimensions. And the method of evaluating based on the shape is popular. In this study, we conducted experiments for averaging method of the pattern (Measurement Based Contouring) as two-dimensional mask and silicon evaluation technique. That is, observation of the identical position of a mask and a silicon was considered. It is possible to analyze variability of the edge of the same position with high precision. The result proved its detection accuracy and reliability of variability on two-dimensional pattern (mask and

  20. New method of contour-based mask-shape compiler

    Science.gov (United States)

    Matsuoka, Ryoichi; Sugiyama, Akiyuki; Onizawa, Akira; Sato, Hidetoshi; Toyoda, Yasutaka

    2007-10-01

    We have developed a new method of accurately profiling a mask shape by utilizing a Mask CD-SEM. The method is intended to realize high accuracy, stability and reproducibility of the Mask CD-SEM adopting an edge detection algorithm as the key technology used in CD-SEM for high accuracy CD measurement. In comparison with a conventional image processing method for contour profiling, it is possible to create the profiles with much higher accuracy which is comparable with CD-SEM for semiconductor device CD measurement. In this report, we will introduce the algorithm in general, the experimental results and the application in practice. As shrinkage of design rule for semiconductor device has further advanced, an aggressive OPC (Optical Proximity Correction) is indispensable in RET (Resolution Enhancement Technology). From the view point of DFM (Design for Manufacturability), a dramatic increase of data processing cost for advanced MDP (Mask Data Preparation) for instance and surge of mask making cost have become a big concern to the device manufacturers. In a sense, it is a trade-off between the high accuracy RET and the mask production cost, while it gives a significant impact on the semiconductor market centered around the mask business. To cope with the problem, we propose the best method for a DFM solution in which two dimensional data are extracted for an error free practical simulation by precise reproduction of a real mask shape in addition to the mask data simulation. The flow centering around the design data is fully automated and provides an environment where optimization and verification for fully automated model calibration with much less error is available. It also allows complete consolidation of input and output functions with an EDA system by constructing a design data oriented system structure. This method therefore is regarded as a strategic DFM approach in the semiconductor metrology.

  1. Research on volume metrology method of large vertical energy storage tank based on internal electro-optical distance-ranging method

    Science.gov (United States)

    Hao, Huadong; Shi, Haolei; Yi, Pengju; Liu, Ying; Li, Cunjun; Li, Shuguang

    2018-01-01

    A Volume Metrology method based on Internal Electro-optical Distance-ranging method is established for large vertical energy storage tank. After analyzing the vertical tank volume calculation mathematical model, the key processing algorithms, such as gross error elimination, filtering, streamline, and radius calculation are studied for the point cloud data. The corresponding volume values are automatically calculated in the different liquids by calculating the cross-sectional area along the horizontal direction and integrating from vertical direction. To design the comparison system, a vertical tank which the nominal capacity is 20,000 m3 is selected as the research object, and there are shown that the method has good repeatability and reproducibility. Through using the conventional capacity measurement method as reference, the relative deviation of calculated volume is less than 0.1%, meeting the measurement requirements. And the feasibility and effectiveness are demonstrated.

  2. Fabrication of fiber optic long period gratings operating at the phase matching turning point using an amplitude mask

    Science.gov (United States)

    Hromadka, J.; Correia, R.; Korposh, S.

    2016-05-01

    A fast method for the fabrication of the long period gratings (LPG) optical fibres operating at or near the phase matching turning point (PMTP) with the period of 109.0, 109.5 and 110.0 μm based on an amplitude mask writing system is described. The proposed system allows fabricating 3 cm long LPG sensors operating at PMPT within 20 min that is approximately 8 times faster than point-by-point approach. The reproducibility of the fabrication process was thoroughly studied. The response of the fabricated LPGs to the external change of the refractive index was investigated using water and methanol.

  3. Nanoelectronics: Metrology and Computation

    International Nuclear Information System (INIS)

    Lundstrom, Mark; Clark, Jason V.; Klimeck, Gerhard; Raman, Arvind

    2007-01-01

    Research in nanoelectronics poses new challenges for metrology, but advances in theory, simulation and computing and networking technology provide new opportunities to couple simulation and metrology. This paper begins with a brief overview of current work in computational nanoelectronics. Three examples of how computation can assist metrology will then be discussed. The paper concludes with a discussion of how cyberinfrastructure can help connect computing and metrology using the nanoHUB (www.nanoHUB.org) as a specific example

  4. Metrology for ITER Assembly

    International Nuclear Information System (INIS)

    Bogusch, E.

    2006-01-01

    The overall dimensions of the ITER Tokamak and the particular assembly sequence preclude the use of conventional optical metrology, mechanical jigs and traditional dimensional control equipment, as used for the assembly of smaller, previous generation, fusion devices. This paper describes the state of the art of the capabilities of available metrology systems, with reference to the previous experience in Fusion engineering and in other industries. Two complementary procedures of transferring datum from the primary datum network on the bioshield to the secondary datum s inside the VV with the desired accuracy of about 0.1 mm is described, one method using the access directly through the ports and the other using transfer techniques, developed during the co-operation with ITER/EFDA. Another important task described is the development of a method for the rapid and easy measurement of the gaps between sectors, required for the production of the customised splice plates between them. The scope of the paper includes the evaluation of the composition and cost of the systems and team of technical staff required to meet the requirements of the assembly procedure. The results from a practical, full-scale demonstration of the methodologies used, using the proposed equipment, is described. This work has demonstrated the feasibility of achieving the necessary accuracies for the successful building of ITER. (author)

  5. Capability Handbook- offline metrology

    DEFF Research Database (Denmark)

    Islam, Aminul; Marhöfer, David Maximilian; Tosello, Guido

    This offline metrological capability handbook has been made in relation to HiMicro Task 3.3. The purpose of this document is to assess the metrological capability of the HiMicro partners and to gather the information of all available metrological instruments in the one single document. It provides...

  6. TSOM method for semiconductor metrology

    Science.gov (United States)

    Attota, Ravikiran; Dixson, Ronald G.; Kramar, John A.; Potzick, James E.; Vladár, András E.; Bunday, Benjamin; Novak, Erik; Rudack, Andrew

    2011-03-01

    Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement sensitivity using conventional optical microscopes; measurement sensitivities are comparable to what is typical when using scatterometry, scanning electron microscopy (SEM), and atomic force microscopy (AFM). TSOM can be used in both reflection and transmission modes and is applicable to a variety of target materials and shapes. Nanometrology applications that have been demonstrated by experiments or simulations include defect analysis, inspection and process control; critical dimension, photomask, overlay, nanoparticle, thin film, and 3D interconnect metrologies; line-edge roughness measurements; and nanoscale movements of parts in MEMS/NEMS. Industries that could benefit include semiconductor, data storage, photonics, biotechnology, and nanomanufacturing. TSOM is relatively simple and inexpensive, has a high throughput, and provides nanoscale sensitivity for 3D measurements with potentially significant savings and yield improvements in manufacturing.

  7. Frequency Standards and Metrology

    Science.gov (United States)

    Maleki, Lute

    2009-04-01

    Preface / Lute Maleki -- Symposium history / Jacques Vanier -- Symposium photos -- pt. I. Fundamental physics. Variation of fundamental constants from the big bang to atomic clocks: theory and observations (Invited) / V. V. Flambaum and J. C. Berengut. Alpha-dot or not: comparison of two single atom optical clocks (Invited) / T. Rosenband ... [et al.]. Variation of the fine-structure constant and laser cooling of atomic dysprosium (Invited) / N. A. Leefer ... [et al.]. Measurement of short range forces using cold atoms (Invited) / F. Pereira Dos Santos ... [et al.]. Atom interferometry experiments in fundamental physics (Invited) / S. W. Chiow ... [et al.]. Space science applications of frequency standards and metrology (Invited) / M. Tinto -- pt. II. Frequency & metrology. Quantum metrology with lattice-confined ultracold Sr atoms (Invited) / A. D. Ludlow ... [et al.]. LNE-SYRTE clock ensemble: new [symbol]Rb hyperfine frequency measurement - spectroscopy of [symbol]Hg optical clock transition (Invited) / M. Petersen ... [et al.]. Precise measurements of S-wave scattering phase shifts with a juggling atomic clock (Invited) / S. Gensemer ... [et al.]. Absolute frequency measurement of the [symbol] clock transition (Invited) / M. Chwalla ... [et al.]. The semiclassical stochastic-field/atom interaction problem (Invited) / J. Camparo. Phase and frequency noise metrology (Invited) / E. Rubiola ... [et al.]. Optical spectroscopy of atomic hydrogen for an improved determination of the Rydberg constant / J. L. Flowers ... [et al.] -- pt. III. Clock applications in space. Recent progress on the ACES mission (Invited) / L. Cacciapuoti and C. Salomon. The SAGAS mission (Invited) / P. Wolf. Small mercury microwave ion clock for navigation and radioScience (Invited) / J. D. Prestage ... [et al.]. Astro-comb: revolutionizing precision spectroscopy in astrophysics (Invited) / C. E. Kramer ... [et al.]. High frequency very long baseline interferometry: frequency standards and

  8. 3D wide field-of-view Gabor-domain optical coherence microscopy advancing real-time in-vivo imaging and metrology

    Science.gov (United States)

    Canavesi, Cristina; Cogliati, Andrea; Hayes, Adam; Tankam, Patrice; Santhanam, Anand; Rolland, Jannick P.

    2017-02-01

    Real-time volumetric high-definition wide-field-of-view in-vivo cellular imaging requires micron-scale resolution in 3D. Compactness of the handheld device and distortion-free images with cellular resolution are also critically required for onsite use in clinical applications. By integrating a custom liquid lens-based microscope and a dual-axis MEMS scanner in a compact handheld probe, Gabor-domain optical coherence microscopy (GD-OCM) breaks the lateral resolution limit of optical coherence tomography through depth, overcoming the tradeoff between numerical aperture and depth of focus, enabling advances in biotechnology. Furthermore, distortion-free imaging with no post-processing is achieved with a compact, lightweight handheld MEMS scanner that obtained a 12-fold reduction in volume and 17-fold reduction in weight over a previous dual-mirror galvanometer-based scanner. Approaching the holy grail of medical imaging - noninvasive real-time imaging with histologic resolution - GD-OCM demonstrates invariant resolution of 2 μm throughout a volume of 1 x 1 x 0.6 mm3, acquired and visualized in less than 2 minutes with parallel processing on graphics processing units. Results on the metrology of manufactured materials and imaging of human tissue with GD-OCM are presented.

  9. Diffraction-based overlay metrology for double patterning technologies

    Science.gov (United States)

    Dasari, Prasad; Korlahalli, Rahul; Li, Jie; Smith, Nigel; Kritsun, Oleg; Volkman, Cathy

    2009-03-01

    The extension of optical lithography to 32nm and beyond is made possible by Double Patterning Techniques (DPT) at critical levels of the process flow. The ease of DPT implementation is hindered by increased significance of critical dimension uniformity and overlay errors. Diffraction-based overlay (DBO) has shown to be an effective metrology solution for accurate determination of the overlay errors associated with double patterning [1, 2] processes. In this paper we will report its use in litho-freeze-litho-etch (LFLE) and spacer double patterning technology (SDPT), which are pitch splitting solutions that reduce the significance of overlay errors. Since the control of overlay between various mask/level combinations is critical for fabrication, precise and accurate assessment of errors by advanced metrology techniques such as spectroscopic diffraction based overlay (DBO) and traditional image-based overlay (IBO) using advanced target designs will be reported. A comparison between DBO, IBO and CD-SEM measurements will be reported. . A discussion of TMU requirements for 32nm technology and TMU performance data of LFLE and SDPT targets by different overlay approaches will be presented.

  10. Influence of optical fiber location behind an apodized phase mask on Bragg grating reflection efficiencies at Bragg wavelength and its harmonics

    Science.gov (United States)

    Osuch, Tomasz; Jaroszewicz, Zbigniew

    2017-01-01

    An apodized fiber Bragg grating formation using a phase mask with variable duty cycle is numerically analyzed. In particular, an impact of position of an optical fiber behind the phase mask with Gaussian apodization profile on Bragg grating reflection efficiencies at Bragg wavelength and its harmonics is extensively studied. It is shown that reflection efficiency of each harmonic strongly depends on the optical fiber location with respect to the adjacent Talbot planes during the grating inscription. An analytical formula for calculation such periodical changes of reflection strength is proposed. It is also proved, that the smaller optical fiber diameter the higher fluctuations of reflectivity for particular harmonic occur. Results presented for such general case (i.e. phase mask with variable duty cycle with all non-zero diffraction orders) directly correspond to less complex structures, such as uniform phase masks and those with variable groove depth. They are also useful in optimization of Bragg wavelength and harmonic reflection efficiencies as well as in deep understanding of apodized FBG formation using aforementioned phase masks.

  11. SU-F-J-18: Feasibility of Open Mask Immobilization with Optical Imaging Guidance (OIG) for H&N Radiotherapy

    International Nuclear Information System (INIS)

    Zhao, B; Maquilan, G; Anders, M; Jiang, S; Schwartz, D

    2016-01-01

    Purpose: Full face and neck thermoplastic masks provide standard-of-care immobilization for patients receiving H&N IMRT. However, these masks are uncomfortable and increase skin dose. The purpose of this pilot study was to investigate the feasibility and setup accuracy of open face and neck mask immobilization with OIG. Methods: Ten patients were consented and enrolled to this IRB-approved protocol. Patients were immobilized with open masks securing only forehead and chin. Standard IMRT to 60–70 Gy in 30 fractions were delivered in all cases. Patient simulation information, including isocenter location and CT skin contours, were imported to a commercial OIG system. On the first day of treatment, patients were initially set up to surface markings and then OIG referenced to face and neck skin regions of interest (ROI) localized on simulation CT images, followed by in-room CBCT. CBCTs were acquired at least weekly while planar OBI was acquired on the days without CBCT. Following 6D robotic couch correction with kV imaging, a new optical real-time surface image was acquired to track intrafraction motion and to serve as a reference surface for setup at the next treatment fraction. Therapists manually recorded total treatment time as well as couch shifts based on kV imaging. Intrafractional ROI motion tracking was automatically recorded. Results: Setup accuracy of OIG was compared with CBCT results. The setup error based on OIG was represented as a 6D shift (vertical/longitudinal/lateral/rotation/pitch/roll). Mean error values were −0.70±3.04mm, −0.69±2.77mm, 0.33±2.67 mm, −0.14±0.94 o, −0.15±1.10o and 0.12±0.82o, respectively for the cohort. Average treatment time was 24.1±9.2 minutes, comparable to standard immobilization. The amplitude of intrafractional ROI motion was 0.69±0.36 mm, driven primarily by respiratory neck motion. Conclusion: OGI can potentially provide accurate setup and treatment tracking for open face and neck immobilization. Study

  12. SU-F-J-18: Feasibility of Open Mask Immobilization with Optical Imaging Guidance (OIG) for H&N Radiotherapy

    Energy Technology Data Exchange (ETDEWEB)

    Zhao, B; Maquilan, G; Anders, M; Jiang, S; Schwartz, D [UT Southwestern Medical Center, Dallas, TX (United States)

    2016-06-15

    Purpose: Full face and neck thermoplastic masks provide standard-of-care immobilization for patients receiving H&N IMRT. However, these masks are uncomfortable and increase skin dose. The purpose of this pilot study was to investigate the feasibility and setup accuracy of open face and neck mask immobilization with OIG. Methods: Ten patients were consented and enrolled to this IRB-approved protocol. Patients were immobilized with open masks securing only forehead and chin. Standard IMRT to 60–70 Gy in 30 fractions were delivered in all cases. Patient simulation information, including isocenter location and CT skin contours, were imported to a commercial OIG system. On the first day of treatment, patients were initially set up to surface markings and then OIG referenced to face and neck skin regions of interest (ROI) localized on simulation CT images, followed by in-room CBCT. CBCTs were acquired at least weekly while planar OBI was acquired on the days without CBCT. Following 6D robotic couch correction with kV imaging, a new optical real-time surface image was acquired to track intrafraction motion and to serve as a reference surface for setup at the next treatment fraction. Therapists manually recorded total treatment time as well as couch shifts based on kV imaging. Intrafractional ROI motion tracking was automatically recorded. Results: Setup accuracy of OIG was compared with CBCT results. The setup error based on OIG was represented as a 6D shift (vertical/longitudinal/lateral/rotation/pitch/roll). Mean error values were −0.70±3.04mm, −0.69±2.77mm, 0.33±2.67 mm, −0.14±0.94 o, −0.15±1.10o and 0.12±0.82o, respectively for the cohort. Average treatment time was 24.1±9.2 minutes, comparable to standard immobilization. The amplitude of intrafractional ROI motion was 0.69±0.36 mm, driven primarily by respiratory neck motion. Conclusion: OGI can potentially provide accurate setup and treatment tracking for open face and neck immobilization. Study

  13. Nonarteritic ischemic optic neuropathy secondary to severe ocular hypertension masked by interface fluid in a post-LASIK eye.

    Science.gov (United States)

    Pham, Mai T; Peck, Rachel E; Dobbins, Kendall R B

    2013-06-01

    We report a case of ischemic optic neuropathy arising from elevated intraocular pressure (IOP) masked by interface fluid in a post-laser in situ keratomileusis (LASIK) eye. A 51-year-old man, who had had LASIK 6 years prior to presentation, sustained blunt trauma to the left eye that resulted in a hyphema and ocular hypertension. Elevated IOP resulted in accumulation of fluid in the stromal bed-LASIK flap interface, leading to underestimation of IOP when measured centrally over the flap. After days of unrecognized ocular hypertension, ischemic optic neuropathy developed. To our knowledge, this is the first reported case of ischemic optic neuropathy resulting from underestimated IOP measurements in a post-LASIK patient. It highlights the inaccuracy of IOP measurements in post-LASIK eyes and a vision-threatening potential complication. No author has a financial or proprietary interest in any material or method mentioned. Copyright © 2013 ASCRS and ESCRS. Published by Elsevier Inc. All rights reserved.

  14. The future of 2D metrology for display manufacturing

    Science.gov (United States)

    Sandstrom, Tor; Wahlsten, Mikael; Park, Youngjin

    2016-10-01

    The race to 800 PPI and higher in mobile devices and the transition to OLED displays are driving a dramatic development of mask quality: resolution, CDU, registration, and complexity. 2D metrology for large area masks is necessary and must follow the roadmap. Driving forces in the market place point to continued development of even more dense displays. State-of-the-art metrology has proven itself capable of overlay below 40 nm and registration below 65 nm for G6 masks. Future developments include incoming and recurrent measurements of pellicalized masks at the panel maker's factory site. Standardization of coordinate systems across supplier networks is feasible. This will enable better yield and production economy for both mask and panel maker. Better distortion correction methods will give better registration on the panels and relax the flatness requirements of the mask blanks. If panels are measured together with masks and the results are used to characterize the aligners, further quality and yield improvements are possible. Possible future developments include in-cell metrology and integration with other instruments in the same platform.

  15. Optical image encryption using fresnel zone plate mask based on fast walsh hadamard transform

    Science.gov (United States)

    Khurana, Mehak; Singh, Hukum

    2018-05-01

    A new symmetric encryption technique using Fresnel Zone Plate (FZP) based on Fast Walsh Hadamard Transform (FWHT) is proposed for security enhancement. In this technique, bits of plain image is randomized by shuffling the bits randomly. The obtained scrambled image is then masked with FZP using symmetric encryption in FWHT domain to obtain final encrypted image. FWHT has been used in the cryptosystem so as to protect image data from the quantization error and for reconstructing the image perfectly. The FZP used in proposed scheme increases the key space and makes it robust to many traditional attacks. The effectiveness and robustness of the proposed cryptosystem has been analyzed on the basis of various parameters by simulating on MATLAB 8.1.0 (R2012b). The experimental results are provided to highlight suitability of the proposed cryptosystem and prove that the system is secure.

  16. Metrology of image placement

    International Nuclear Information System (INIS)

    Starikov, Alexander

    1998-01-01

    Metrology of registration, overlay and alignment offset in microlithography are discussed. Requirements and limitations are traced to the device ground rules and the definitions of edge, linewidth and centerline. Precision, accuracy, system performance and metrology in applications are discussed. The impact of image acquisition and data handling on performance is elucidated. Much attention is given to the manufacturing environment and effects of processing. General new methods of metrology error diagnostics and technology characterization are introduced and illustrated. Applications of these diagnostics to tests of tool performance, error diagnostics and culling, as well as to process integration in manufacturing are described. Realistic overlay reference materials and results of accuracy evaluations are discussed. Requirements in primary standards and alternative metrology are explained. The role and capability of SEM based overlay metrology is described, along with applications to device overlay metrology

  17. Optical metrology of Ni and NiSi thin films used in the self-aligned silicidation process

    International Nuclear Information System (INIS)

    Kamineni, V. K.; Bersch, E. J.; Diebold, A. C.; Raymond, M.; Doris, B. B.

    2010-01-01

    The thickness-dependent optical properties of nickel metal and nickel monosilicide (NiSi) thin films, used for self-aligned silicidation process, were characterized using spectroscopic ellipsometry. The thickness-dependent complex dielectric function of nickel metal films is shown to be correlated with the change in Drude free electron relaxation time. The change in relaxation time can be traced to the change in grain boundary (GB) reflection coefficient and grain size. A resistivity based model was used as the complementary method to the thickness-dependent optical model to trace the change in GB reflection coefficient and grain size. After silicidation, the complex dielectric function of NiSi films exhibit non-Drude behavior due to superimposition of interband absorptions arising at lower frequencies. The Optical models of the complete film stack were refined using x-ray photoelectron spectroscopy, Rutherford backscattered spectroscopy, and x-ray reflectivity (XRR).

  18. Measuring the In-Process Figure, Final Prescription, and System Alignment of Large Optics and Segmented Mirrors Using Lidar Metrology

    Science.gov (United States)

    Ohl, Raymond; Slotwinski, Anthony; Eegholm, Bente; Saif, Babak

    2011-01-01

    The fabrication of large optics is traditionally a slow process, and fabrication capability is often limited by measurement capability. W hile techniques exist to measure mirror figure with nanometer precis ion, measurements of large-mirror prescription are typically limited to submillimeter accuracy. Using a lidar instrument enables one to measure the optical surface rough figure and prescription in virtuall y all phases of fabrication without moving the mirror from its polis hing setup. This technology improves the uncertainty of mirror presc ription measurement to the micron-regime.

  19. Constellation of phase singularities in a speckle-like pattern for optical vortex metrology applied to biological kinematic analysis

    DEFF Research Database (Denmark)

    Wang, Wei; Qiao, Yu; Ishijima, Reika

    2008-01-01

    A novel technique for biological kinematic analysis is proposed that makes use of the pseudophase singularities in a complex signal generated from a speckle-like pattern. In addition to the information about the locations and the anisotropic core structures of the pseudophase singularities, we al...... are presented, which demonstrate the validity of the proposed technique. (c) 2008 Optical Society of America....

  20. Advances in speckle metrology and related techniques

    CERN Document Server

    Kaufmann, Guillermo H

    2010-01-01

    Speckle metrology includes various optical techniques that are based on the speckle fields generated by reflection from a rough surface or by transmission through a rough diffuser. These techniques have proven to be very useful in testing different materials in a non-destructive way. They have changed dramatically during the last years due to the development of modern optical components, with faster and more powerful digital computers, and novel data processing approaches. This most up-to-date overview of the topic describes new techniques developed in the field of speckle metrology over the l

  1. SAQP pitch walk metrology using single target metrology

    Science.gov (United States)

    Fang, Fang; Herrera, Pedro; Kagalwala, Taher; Camp, Janay; Vaid, Alok; Pandev, Stilian; Zach, Franz

    2017-03-01

    Self-aligned quadruple patterning (SAQP) processes have found widespread acceptance in advanced technology nodes to drive device scaling beyond the resolution limitations of immersion scanners. Of the four spaces generated in this process from one lithography pattern two tend to be equivalent as they are derived from the first spacer deposition. The three independent spaces are commonly labelled as α, β and γ. α, β and γ are controlled by multiple process steps including the initial lithographic patterning process, the two mandrel and spacer etches as well as the two spacer depositions. Scatterometry has been the preferred metrology approach, however is restricted to repetitive arrays. In these arrays independent measurements, in particular of alpha and gamma, are not possible due to degeneracy of the standard array targets. . In this work we present a single target approach which lifts the degeneracies commonly encountered while using product relevant layout geometries. We will first describe the metrology approach which includes the previously described SRM (signal response metrology) combined with reference data derived from CD SEM data. The performance of the methodology is shown in figures 1-3. In these figures the optically determined values for alpha, beta and gamma are compared to the CD SEM reference data. The variations are achieved using controlled process experiments varying Mandrel CD and Spacer deposition thicknesses.

  2. Metrology and testing

    International Nuclear Information System (INIS)

    2010-01-01

    The chapter presents the Metrology Service of Ionizing Radiation (SEMRI), the Metrology Service of Radioisotopes (SEMRA), the External Individual Monitoring Service (SEMEX), the Internal Individual Monitoring Service (SEMIN) and the associated laboratories, the analysis of environmental samples, system for management of quality from IRD and the National Program for intercomparison results of environmental samples analysis to radioisotopes determination

  3. NIF Target Assembly Metrology Methodology and Results

    Energy Technology Data Exchange (ETDEWEB)

    Alger, E. T. [General Atomics, San Diego, CA (United States); Kroll, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Dzenitis, E. G. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Montesanti, R. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Hughes, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Swisher, M. [IAP, Livermore, CA (United States); Taylor, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Segraves, K. [IAP, Livermore, CA (United States); Lord, D. M. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Reynolds, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Castro, C. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Edwards, G. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

    2011-01-01

    During our inertial confinement fusion (ICF) experiments at the National Ignition Facility (NIF) we require cryogenic targets at the 1-cm scale to be fabricated, assembled, and metrologized to micron-level tolerances. During assembly of these ICF targets, there are physical dimensmetrology is completed using optical coordinate measurement machines that provide repeatable measurements with micron precision, while also allowing in-process data collection for absolute accuracy in assembly. To date, 51 targets have been assembled and metrologized, and 34 targets have been successfully fielded on NIF relying on these metrology data. In the near future, ignition experiments on NIF will require tighter tolerances and more demanding target assembly and metrology capability. Metrology methods, calculations, and uncertainty estimates will be discussed. Target diagnostic port alignment, target position, and capsule location results will be reviewed for the 2009 Energetics Campaign. The information is presented via control charts showing the effect of process improvements that were made during target production. Certain parameters, including capsule position, met the 2009 campaign specifications but will have much tighter requirements in the future. Finally, in order to meet these new requirements assembly process changes and metrology capability upgrades will be necessary.

  4. SU-E-T-603: Analysis of Optical Tracked Head Inter-Fraction Movements Within Masks to Access Intracranial Immobilization Techniques in Proton Therapy

    International Nuclear Information System (INIS)

    Hsi, W; Zeidan, O

    2014-01-01

    Purpose: We present a quantitative methodology utilizing an optical tracking system for monitoring head inter-fraction movements within brain masks to assess the effectiveness of two intracranial immobilization techniques. Methods and Materials: A 3-point-tracking method was developed to measure the mask location for a treatment field at each fraction. Measured displacement of mask location to its location at first fraction is equivalent to the head movement within the mask. Head movements for each of treatment fields were measured over about 10 fractions at each patient for seven patients; five treated in supine and two treated in prone. The Q-fix Base-of-Skull head frame was used in supine while the CIVCO uni-frame baseplate was used in prone. Displacements of recoded couch position of each field post imaging at each fraction were extracted for those seven patients. Standard deviation (S.D.) of head movements and couch displacements was scored for statistical analysis. Results: The accuracy of 3PtTrack method was within 1.0 mm by phantom measurements. Patterns of head movement and couch displacement were similar for patients treated in either supine or prone. In superior-inferior direction, mean value of scored standard deviations over seven patients were 1.6 mm and 3.4 mm for the head movement and the couch displacement, respectively. The result indicated that the head movement combined with a loose fixation between the mask-to-head frame results large couch displacements for each patient, and also large variation between patients. However, the head movement is the main cause for the couch displacement with similar magnitude of around 1.0 mm in anterior-posterior and lateral directions. Conclusions: Optical-tracking methodology independently quantifying head movements could improve immobilization devices by correctly acting on causes for head motions within mask. A confidence in the quality of intracranial immobilization techniques could be more efficient by

  5. Metrological 2iOF fibre-optic system for position and displacement measurement with 31 pm resolution

    Science.gov (United States)

    Orłowska, Karolina; Świåtkowski, Michał; Kunicki, Piotr; Gotszalk, Teodor

    2018-04-01

    In the present paper, we describe a high sensitivity intensity fibre-optic displacement sensor with tens of picometre resolution combined with a sub-picometre resolution interferometric calibration system. Both integrated components form the so-called "2 in one ferrule" system 2iOF. The design and construction of the presented device depend on integrating two sensors' systems within one fibre-optic measuring head, which allows performing in situ calibration process with no additional time-consuming adjustment procedure. The resolution of the 2iOF system is 31 pm/Hz1/2 obtained with an interferometric Fabry-Perot based calibration system—providing accuracy better than tens of fm/Hz1/2 within 1 MHz bandwidth in the measurement range of up to 100 μm. The direct response from the intensity sensor is then the 2iOF output one. It is faster and more convenient to analyze in comparison, with much better resolution (3 orders of magnitude higher) but on the other hand also more time consuming and dependent on the absolute sample position interferometer. The proposed system is flexible and open to various applications. We will present the results of the piezoelectrical actuator displacement measurements, which were performed using the developed system.

  6. Comparison of optical beam smoothing techniques for inertial confinement fusion and improvement of smoothing by the use of zero-correlation masks

    International Nuclear Information System (INIS)

    Lehmberg, R. H.; Rothenberg, J. E.

    2000-01-01

    We present analytic theory and numerical simulations comparing the optical beam smoothing capabilities of the smoothing by spectral dispersion (SSD) technique using random temporal phase modulation, with that of the induced spatial incoherence technique. The analytic theory provides a simple formula for the SSD mode spectrum in the usual case where the phase mask at the focusing lens is random, and its asymptotic limit quantitatively relates the long wavelength mode smoothing to the width of the angular dispersion. With parameters and phase aberration relevant to the National Ignition Facility beams, the SSD simulations show that the large long wavelength components, which are also found in earlier simulations, can be significantly reduced by replacing the independent random phase masks in each pair of adjacent beams by a conjugate pair of zero-correlation masks. These simulations suggest that one can combine zero-correlation masks with random temporal phase modulation and multiple color cycles to achieve SSD smoothing approaching the optical bandwidth limit at all spatial frequencies, without using large angular dispersions. (c) 2000 American Institute of Physics

  7. Enabling optical metrology on small 5×5μm2 in-cell targets to support flexible sampling and higher order overlay and CD control for advanced logic devices nodes

    Science.gov (United States)

    Salerno, Antonio; de la Fuente, Isabel; Hsu, Zack; Tai, Alan; Chang, Hammer; McNamara, Elliott; Cramer, Hugo; Li, Daoping

    2018-03-01

    In next generation Logic devices, overlay control requirements shrink to sub 2.5nm level on-product overlay. Historically on-product overlay has been defined by the overlay capability of after-develop in-scribe targets. However, due to design and dimension, the after development metrology targets are not completely representative for the final overlay of the device. In addition, they are confined to the scribe-lane area, which limits the sampling possibilities. To address these two issues, metrology on structures matching the device structure and which can be sampled with high density across the device is required. Conventional after-etch CDSEM techniques on logic devices present difficulties in discerning the layers of interest, potential destructive charging effects and finally, they are limited by the long measurement times[1] [2] [3] . All together, limit the sampling densities and making CDSEM less attractive for control applications. Optical metrology can overcome most of these limitations. Such measurement, however, does require repetitive structures. This requirement is not fulfilled by logic devices, as the features vary in pitch and CD over the exposure field. The solution is to use small targets, with a maximum pad size of 5x5um2 , which can easily be placed in the logic cell area. These targets share the process and architecture of the device features of interest, but with a modified design that replicates as close as possible the device layout, allowing for in-device metrology for both CD and Overlay. This solution enables measuring closer to the actual product feature location and, not being limited to scribe-lanes, it opens the possibility of higher-density sampling schemes across the field. In summary, these targets become the facilitator of in-device metrology (IDM), that is, enabling the measurements both in-device Overlay and the CD parameters of interest and can deliver accurate, high-throughput, dense and after-etch measurements for Logic

  8. Context-based virtual metrology

    Science.gov (United States)

    Ebersbach, Peter; Urbanowicz, Adam M.; Likhachev, Dmitriy; Hartig, Carsten; Shifrin, Michael

    2018-03-01

    Hybrid and data feed forward methodologies are well established for advanced optical process control solutions in highvolume semiconductor manufacturing. Appropriate information from previous measurements, transferred into advanced optical model(s) at following step(s), provides enhanced accuracy and exactness of the measured topographic (thicknesses, critical dimensions, etc.) and material parameters. In some cases, hybrid or feed-forward data are missed or invalid for dies or for a whole wafer. We focus on approaches of virtual metrology to re-create hybrid or feed-forward data inputs in high-volume manufacturing. We discuss missing data inputs reconstruction which is based on various interpolation and extrapolation schemes and uses information about wafer's process history. Moreover, we demonstrate data reconstruction approach based on machine learning techniques utilizing optical model and measured spectra. And finally, we investigate metrics that allow one to assess error margin of virtual data input.

  9. Statistical metrology - measurement and modeling of variation for advanced process development and design rule generation

    International Nuclear Information System (INIS)

    Boning, Duane S.; Chung, James E.

    1998-01-01

    Advanced process technology will require more detailed understanding and tighter control of variation in devices and interconnects. The purpose of statistical metrology is to provide methods to measure and characterize variation, to model systematic and random components of that variation, and to understand the impact of variation on both yield and performance of advanced circuits. Of particular concern are spatial or pattern-dependencies within individual chips; such systematic variation within the chip can have a much larger impact on performance than wafer-level random variation. Statistical metrology methods will play an important role in the creation of design rules for advanced technologies. For example, a key issue in multilayer interconnect is the uniformity of interlevel dielectric (ILD) thickness within the chip. For the case of ILD thickness, we describe phases of statistical metrology development and application to understanding and modeling thickness variation arising from chemical-mechanical polishing (CMP). These phases include screening experiments including design of test structures and test masks to gather electrical or optical data, techniques for statistical decomposition and analysis of the data, and approaches to calibrating empirical and physical variation models. These models can be integrated with circuit CAD tools to evaluate different process integration or design rule strategies. One focus for the generation of interconnect design rules are guidelines for the use of 'dummy fill' or 'metal fill' to improve the uniformity of underlying metal density and thus improve the uniformity of oxide thickness within the die. Trade-offs that can be evaluated via statistical metrology include the improvements to uniformity possible versus the effect of increased capacitance due to additional metal

  10. An OCD perspective of line edge and line width roughness metrology

    Science.gov (United States)

    Bonam, Ravi; Muthinti, Raja; Breton, Mary; Liu, Chi-Chun; Sieg, Stuart; Seshadri, Indira; Saulnier, Nicole; Shearer, Jeffrey; Patlolla, Raghuveer; Huang, Huai

    2017-03-01

    Metrology of nanoscale patterns poses multiple challenges that range from measurement noise, metrology errors, probe size etc. Optical Metrology has gained a lot of significance in the semiconductor industry due to its fast turn around and reliable accuracy, particularly to monitor in-line process variations. Apart from monitoring critical dimension, thickness of films, there are multiple parameters that can be extracted from Optical Metrology models3. Sidewall angles, material compositions etc., can also be modeled to acceptable accuracy. Line edge and Line Width roughness are much sought of metrology following critical dimension and its uniformity, although there has not been much development in them with optical metrology. Scanning Electron Microscopy is still used as a standard metrology technique for assessment of Line Edge and Line Width roughness. In this work we present an assessment of Optical Metrology and its ability to model roughness from a set of structures with intentional jogs to simulate both Line edge and Line width roughness at multiple amplitudes and frequencies. We also present multiple models to represent roughness and extract relevant parameters from Optical metrology. Another critical aspect of optical metrology setup is correlation of measurement to a complementary technique to calibrate models. In this work, we also present comparison of roughness parameters extracted and measured with variation of image processing conditions on a commercially available CD-SEM tool.

  11. 1550 nm superluminescent diode and anti-Stokes effect CCD camera based optical coherence tomography for full-field optical metrology

    Science.gov (United States)

    Kredzinski, Lukasz; Connelly, Michael J.

    2011-06-01

    Optical Coherence Tomography (OCT) is a promising non-invasive imaging technology capable of carrying out 3D high-resolution cross-sectional images of the internal microstructure of examined material. However, almost all of these systems are expensive, requiring the use of complex optical setups, expensive light sources and complicated scanning of the sample under test. In addition most of these systems have not taken advantage of the competitively priced optical components available at wavelength within the main optical communications band located in the 1550 nm region. A comparatively simple and inexpensive full-field OCT system (FF-OCT), based on a superluminescent diode (SLD) light source and anti-stokes imaging device was constructed, to perform 3D cross-sectional imaging. This kind of inexpensive setup with moderate resolution could be easily applicable in low-level biomedical and industrial diagnostics. This paper involves calibration of the system and determines its suitability for imaging structures of biological tissues such as teeth, which has low absorption at 1550 nm.

  12. Metrology for Fuel Cell Manufacturing

    Energy Technology Data Exchange (ETDEWEB)

    Stocker, Michael [National Inst. of Standards and Technology, Gaithersburg, MD (United States); Stanfield, Eric [National Inst. of Standards and Technology, Gaithersburg, MD (United States)

    2015-02-04

    The project was divided into three subprojects. The first subproject is Fuel Cell Manufacturing Variability and Its Impact on Performance. The objective was to determine if flow field channel dimensional variability has an impact on fuel cell performance. The second subproject is Non-contact Sensor Evaluation for Bipolar Plate Manufacturing Process Control and Smart Assembly of Fuel Cell Stacks. The objective was to enable cost reduction in the manufacture of fuel cell plates by providing a rapid non-contact measurement system for in-line process control. The third subproject is Optical Scatterfield Metrology for Online Catalyst Coating Inspection of PEM Soft Goods. The objective was to evaluate the suitability of Optical Scatterfield Microscopy as a viable measurement tool for in situ process control of catalyst coatings.

  13. La Metrología Óptica y sus Aplicaciones La Metrología Óptica y sus Aplicaciones

    OpenAIRE

    Daniel Malacara Hernández

    2012-01-01

    En este trabajo se presenta una introducción al campo de la metrología óptica y de su herramienta principal que es la interferometría. También se presenta un panorama de los diferentes métodos empleados en metrología describiendo con especial detalle los avances más recientes en este campo. In this work an introduction to optical metrology is presented with a brief description of its main tool which is interferometry. Also, a survey of the main different methods used in optical metrology is ...

  14. Metrology of electrical quantum

    International Nuclear Information System (INIS)

    Camon, A.

    1996-01-01

    Since 1989 the electrical metrology laboratory of TPYCEA and the low temperature physics department of ICMA have been collaborating in the development of electrical quantum metrology. ICMA has been mainly dedicated to implement the state of the art quantum standards for which its experience on cryogenics, superconductivity and low noise instrumentation was essential. On the other hand TPYCEA concentrated its efforts on the metrological aspects, in which it has great experience. The complimentary knowledge of both laboratories, as well as the advice obtained from several prestigious metrology institutes was the key to successful completion of the two projects so far developed: i) The Josephson voltage standard (1989-1991) ii) The quantum Hall resistance standard (1991-1996) This report contains a description of both projects. Even though we can consider that the two projects are finished from the instrumental and metrological point of view, there is still a strong cooperation between ICMA and TPYCEA on the improvement of these standards, as well as on their international validation

  15. Implementation of machine learning for high-volume manufacturing metrology challenges (Conference Presentation)

    Science.gov (United States)

    Timoney, Padraig; Kagalwala, Taher; Reis, Edward; Lazkani, Houssam; Hurley, Jonathan; Liu, Haibo; Kang, Charles; Isbester, Paul; Yellai, Naren; Shifrin, Michael; Etzioni, Yoav

    2018-03-01

    In recent years, the combination of device scaling, complex 3D device architecture and tightening process tolerances have strained the capabilities of optical metrology tools to meet process needs. Two main categories of approaches have been taken to address the evolving process needs. In the first category, new hardware configurations are developed to provide more spectral sensitivity. Most of this category of work will enable next generation optical metrology tools to try to maintain pace with next generation process needs. In the second category, new innovative algorithms have been pursued to increase the value of the existing measurement signal. These algorithms aim to boost sensitivity to the measurement parameter of interest, while reducing the impact of other factors that contribute to signal variability but are not influenced by the process of interest. This paper will evaluate the suitability of machine learning to address high volume manufacturing metrology requirements in both front end of line (FEOL) and back end of line (BEOL) sectors from advanced technology nodes. In the FEOL sector, initial feasibility has been demonstrated to predict the fin CD values from an inline measurement using machine learning. In this study, OCD spectra were acquired after an etch process that occurs earlier in the process flow than where the inline CD is measured. The fin hard mask etch process is known to impact the downstream inline CD value. Figure 1 shows the correlation of predicted CD vs downstream inline CD measurement obtained after the training of the machine learning algorithm. For BEOL, machine learning is shown to provide an additional source of information in prediction of electrical resistance from structures that are not compatible for direct copper height measurement. Figure 2 compares the trench height correlation to electrical resistance (Rs) and the correlation of predicted Rs to the e-test Rs value for a far back end of line (FBEOL) metallization level

  16. A Century of Acoustic Metrology

    DEFF Research Database (Denmark)

    Rasmussen, Knud

    1998-01-01

    The development in acoustic measurement technique over the last century is reviewed with special emphasis on the metrological aspect.......The development in acoustic measurement technique over the last century is reviewed with special emphasis on the metrological aspect....

  17. Radiation protection - quality and metrology

    International Nuclear Information System (INIS)

    Broutin, J.P.

    2002-01-01

    The radiation protection gathers three occupations: radiation protection agents; environment agents ( control and monitoring); metrology agents ( activities measurement and calibration). The quality and the metrology constitute a contribution in the technique competence and the guarantee of the service quality. This article, after a historical aspect of quality and metrology in France explains the advantages of such a policy. (N.C.)

  18. Metrology Department - DEMET

    International Nuclear Information System (INIS)

    1989-01-01

    In this report are presented the activities and purposes of the Metrology Dept. of the Institute of Radioprotection and Dosimetry of Brazilian CNEN. It is also presented a list of services rendered by that Dept., the projects in course, personnel and publications.(J.A.M.M.)

  19. Magnetic nanoparticles. Metrological aspects

    International Nuclear Information System (INIS)

    Nikiforov, V N; Nikiforov, A V; Oxengendler, B L; Turaeva, N N; Sredin, V G

    2011-01-01

    The experiments on influence of the iron oxide cluster size on the specific magnetic moment are performed. Both free and covered clusters are investigated. The experiments are interpreted on the base of core-shell model by analogy to Weizsaecker formula in the nuclear physics. Metrological parameters for the cluster size investigation are obtained.

  20. Joint Research on Scatterometry and AFM Wafer Metrology

    OpenAIRE

    Bodermann, B.; Buhr, E.; Danzebrink, H.U.; Bär, M.; Scholze, F.; Krumrey, M.; Wurm, M.; Klapetek, P.; Hansen, P.E.; Korpelainen, V.; Van Veghel, M.; Yacoot, A.; Siitonen, S.; El Gawhary, O.; Burger, S.

    2011-01-01

    Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both experimental and modelling methods will be enhanced and different methods will be compared with each other and with specially adapted atomic force microscopy (AFM) and scanning electron microscopy (SEM) m...

  1. Measurement capabilities of the Bendix Metrology Organization

    International Nuclear Information System (INIS)

    Barnes, L.M.

    1984-01-01

    The purpose of this manual is to communicate the measurement and calibration capabilities of the Metrology Organization of the Bendix Kansas City Division. Included is a listing of the measurement types and ranges available, and the accuracies normally attainable under conditions at the Kansas City Division. Also described are currently used standards and measurement devices. The manual is divided into four major sections, each describing a broad general area of measurement: mechanical; environmental, gas, liquid; electrical; and optical and radiation

  2. Improving OCD time to solution using Signal Response Metrology

    Science.gov (United States)

    Fang, Fang; Zhang, Xiaoxiao; Vaid, Alok; Pandev, Stilian; Sanko, Dimitry; Ramanathan, Vidya; Venkataraman, Kartik; Haupt, Ronny

    2016-03-01

    In recent technology nodes, advanced process and novel integration scheme have challenged the precision limits of conventional metrology; with critical dimensions (CD) of device reduce to sub-nanometer region. Optical metrology has proved its capability to precisely detect intricate details on the complex structures, however, conventional RCWA-based (rigorous coupled wave analysis) scatterometry has the limitations of long time-to-results and lack of flexibility to adapt to wide process variations. Signal Response Metrology (SRM) is a new metrology technique targeted to alleviate the consumption of engineering and computation resources by eliminating geometric/dispersion modeling and spectral simulation from the workflow. This is achieved by directly correlating the spectra acquired from a set of wafers with known process variations encoded. In SPIE 2015, we presented the results of SRM application in lithography metrology and control [1], accomplished the mission of setting up a new measurement recipe of focus/dose monitoring in hours. This work will demonstrate our recent field exploration of SRM implementation in 20nm technology and beyond, including focus metrology for scanner control; post etch geometric profile measurement, and actual device profile metrology.

  3. Automatic pattern localization across layout database and photolithography mask

    Science.gov (United States)

    Morey, Philippe; Brault, Frederic; Beisser, Eric; Ache, Oliver; Röth, Klaus-Dieter

    2016-03-01

    Advanced process photolithography masks require more and more controls for registration versus design and critical dimension uniformity (CDU). The distribution of the measurement points should be distributed all over the whole mask and may be denser in areas critical to wafer overlay requirements. This means that some, if not many, of theses controls should be made inside the customer die and may use non-dedicated patterns. It is then mandatory to access the original layout database to select patterns for the metrology process. Finding hundreds of relevant patterns in a database containing billions of polygons may be possible, but in addition, it is mandatory to create the complete metrology job fast and reliable. Combining, on one hand, a software expertise in mask databases processing and, on the other hand, advanced skills in control and registration equipment, we have developed a Mask Dataprep Station able to select an appropriate number of measurement targets and their positions in a huge database and automatically create measurement jobs on the corresponding area on the mask for the registration metrology system. In addition, the required design clips are generated from the database in order to perform the rendering procedure on the metrology system. This new methodology has been validated on real production line for the most advanced process. This paper presents the main challenges that we have faced, as well as some results on the global performances.

  4. Masks for extreme ultraviolet lithography

    International Nuclear Information System (INIS)

    Cardinale, G; Goldsmith, J; Kearney, P A; Larson, C; Moore, C E; Prisbrey, S; Tong, W; Vernon, S P; Weber, F; Yan, P-Y.

    1998-01-01

    In extreme ultraviolet lithography (EUVL), the technology specific requirements on the mask are a direct consequence of the utilization of radiation in the spectral region between 10 and 15 nm. At these wavelengths, all condensed materials are highly absorbing and efficient radiation transport mandates the use of all-reflective optical systems. Reflectivity is achieved with resonant, wavelength-matched multilayer (ML) coatings on all of the optical surfaces - including the mask. The EUV mask has a unique architecture - it consists of a substrate with a highly reflective ML coating (the mask blank) that is subsequently over-coated with a patterned absorber layer (the mask). Particulate contamination on the EUVL mask surface, errors in absorber definition and defects in the ML coating all have the potential to print in the lithographic process. While highly developed technologies exist for repair of the absorber layer, no viable strategy for the repair of ML coating defects has been identified. In this paper the state-of-the-art in ML deposition technology, optical inspection of EUVL mask blank defects and candidate absorber patterning approaches are reviewed

  5. A cloud mask methodology for high resolution remote sensing data combining information from high and medium resolution optical sensors

    Science.gov (United States)

    Sedano, Fernando; Kempeneers, Pieter; Strobl, Peter; Kucera, Jan; Vogt, Peter; Seebach, Lucia; San-Miguel-Ayanz, Jesús

    2011-09-01

    This study presents a novel cloud masking approach for high resolution remote sensing images in the context of land cover mapping. As an advantage to traditional methods, the approach does not rely on thermal bands and it is applicable to images from most high resolution earth observation remote sensing sensors. The methodology couples pixel-based seed identification and object-based region growing. The seed identification stage relies on pixel value comparison between high resolution images and cloud free composites at lower spatial resolution from almost simultaneously acquired dates. The methodology was tested taking SPOT4-HRVIR, SPOT5-HRG and IRS-LISS III as high resolution images and cloud free MODIS composites as reference images. The selected scenes included a wide range of cloud types and surface features. The resulting cloud masks were evaluated through visual comparison. They were also compared with ad-hoc independently generated cloud masks and with the automatic cloud cover assessment algorithm (ACCA). In general the results showed an agreement in detected clouds higher than 95% for clouds larger than 50 ha. The approach produced consistent results identifying and mapping clouds of different type and size over various land surfaces including natural vegetation, agriculture land, built-up areas, water bodies and snow.

  6. Overlay metrology for double patterning processes

    Science.gov (United States)

    Leray, Philippe; Cheng, Shaunee; Laidler, David; Kandel, Daniel; Adel, Mike; Dinu, Berta; Polli, Marco; Vasconi, Mauro; Salski, Bartlomiej

    2009-03-01

    The double patterning (DPT) process is foreseen by the industry to be the main solution for the 32 nm technology node and even beyond. Meanwhile process compatibility has to be maintained and the performance of overlay metrology has to improve. To achieve this for Image Based Overlay (IBO), usually the optics of overlay tools are improved. It was also demonstrated that these requirements are achievable with a Diffraction Based Overlay (DBO) technique named SCOLTM [1]. In addition, we believe that overlay measurements with respect to a reference grid are required to achieve the required overlay control [2]. This induces at least a three-fold increase in the number of measurements (2 for double patterned layers to the reference grid and 1 between the double patterned layers). The requirements of process compatibility, enhanced performance and large number of measurements make the choice of overlay metrology for DPT very challenging. In this work we use different flavors of the standard overlay metrology technique (IBO) as well as the new technique (SCOL) to address these three requirements. The compatibility of the corresponding overlay targets with double patterning processes (Litho-Etch-Litho-Etch (LELE); Litho-Freeze-Litho-Etch (LFLE), Spacer defined) is tested. The process impact on different target types is discussed (CD bias LELE, Contrast for LFLE). We compare the standard imaging overlay metrology with non-standard imaging techniques dedicated to double patterning processes (multilayer imaging targets allowing one overlay target instead of three, very small imaging targets). In addition to standard designs already discussed [1], we investigate SCOL target designs specific to double patterning processes. The feedback to the scanner is determined using the different techniques. The final overlay results obtained are compared accordingly. We conclude with the pros and cons of each technique and suggest the optimal metrology strategy for overlay control in double

  7. Remote metrology by comparative digital holography

    International Nuclear Information System (INIS)

    Baumbach, Torsten; Osten, Wolfgang; Kopylow, Christoph von; Jueptner, Werner

    2006-01-01

    A method for the remote comparison of objects with regard to their shape or response to a load is presented. The method allows interferometric sensitivity for comparing objects with different microstructure. In contrast to the well-known incoherent techniques based on inverse fringe projection this new approach uses the coherent optical wave field of the master object as a mask for the illumination of the sample object. The coherent mask is created by digital holography to allow instant access to the complete optical information of the master object at any place desired. The mask is reconstructed by a spatial light modulator (SLM). The optical reconstruction of digital holograms with SLM technology allows modification of reconstructed wavefronts with respect to improvement of image quality, the skilled introduction of additional information about the object (augmented reality), and the alignment of the master and test object

  8. Clay Mask Workshop

    Science.gov (United States)

    Gamble, David L.

    2012-01-01

    Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

  9. Computed tomography for dimensional metrology

    DEFF Research Database (Denmark)

    Kruth, J.P.; Bartscher, M.; Carmignato, S.

    2011-01-01

    metrology, putting emphasis on issues as accuracy, traceability to the unit of length (the meter) and measurement uncertainty. It provides a state of the art (anno 2011) and application examples, showing the aptitude of CT metrology to: (i) check internal dimensions that cannot be measured using traditional...

  10. Metrology's role in quality assurance

    International Nuclear Information System (INIS)

    Zeederberg, L.B.

    1982-01-01

    Metrology, the science of measurement, is playing an increasing role in modern industry as part of an on-going quality assurance programme. At Escom, quality assurance was critical during the construction of the Koeberg nuclear facility, and also a function in controlling services provided by Escom. This article deals with the role metrology plays in quality assurance

  11. Metrology/viewing system for next generation fusion reactors

    International Nuclear Information System (INIS)

    Spampinato, P.T.; Barry, R.E.; Chesser, J.B.; Menon, M.M.; Dagher, M.A.

    1997-01-01

    Next generation fusion reactors require accurate measuring systems to verify sub-millimeter alignment of plasma-facing components in the reactor vessel. A metrology system capable of achieving such accuracy must be compatible with the vessel environment of high gamma radiation, high vacuum, elevated temperature, and magnetic field. This environment requires that the system must be remotely deployed. A coherent, frequency modulated laser radar system is being integrated with a remotely operated deployment system to meet these requirements. The metrology/viewing system consists of a compact laser transceiver optics module which is linked through fiber optics to the laser source and imaging units that are located outside of the harsh environment. The deployment mechanism is a telescopic-mast positioning system. This paper identifies the requirements for the International Thermonuclear Experimental Reactor metrology and viewing system, and describes a remotely operated precision ranging and surface mapping system

  12. Smoke Mask

    Science.gov (United States)

    2003-01-01

    Smoke inhalation injury from the noxious products of fire combustion accounts for as much as 80 percent of fire-related deaths in the United States. Many of these deaths are preventable. Smoke Mask, Inc. (SMI), of Myrtle Beach, South Carolina, is working to decrease these casualties with its line of life safety devices. The SMI personal escape hood and the Guardian Filtration System provide respiratory protection that enables people to escape from hazardous and unsafe conditions. The breathing filter technology utilized in the products is specifically designed to supply breathable air for 20 minutes. In emergencies, 20 minutes can mean the difference between life and death.

  13. World wide matching of registration metrology tools of various generations

    Science.gov (United States)

    Laske, F.; Pudnos, A.; Mackey, L.; Tran, P.; Higuchi, M.; Enkrich, C.; Roeth, K.-D.; Schmidt, K.-H.; Adam, D.; Bender, J.

    2008-10-01

    Turn around time/cycle time is a key success criterion in the semiconductor photomask business. Therefore, global mask suppliers typically allocate work loads based on fab capability and utilization capacity. From a logistical point of view, the manufacturing location of a photomask should be transparent to the customer (mask user). Matching capability of production equipment and especially metrology tools is considered a key enabler to guarantee cross site manufacturing flexibility. Toppan, with manufacturing sites in eight countries worldwide, has an on-going program to match the registration metrology systems of all its production sites. This allows for manufacturing flexibility and risk mitigation.In cooperation with Vistec Semiconductor Systems, Toppan has recently completed a program to match the Vistec LMS IPRO systems at all production sites worldwide. Vistec has developed a new software feature which allows for significantly improved matching of LMS IPRO(x) registration metrology tools of various generations. We will report on the results of the global matching campaign of several of the leading Toppan sites.

  14. Vendor-based laser damage metrology equipment supporting the National Ignition Facility

    International Nuclear Information System (INIS)

    Campbell, J. H; Jennings, R. T.; Kimmons, J. F.; Kozlowski, M. R.; Mouser, R. P.; Schwatz, S.; Stolz, C. J.; Weinzapfel, C. L.

    1998-01-01

    A sizable laser damage metrology effort is required as part of optics production and installation for the 192 beam National Ignition Facility (NIF) laser. The large quantities, high damage thresholds, and large apertures of polished and coated optics necessitates vendor-based metrology equipment to assure component quality during production. This equipment must be optimized to provide the required information as rapidly as possible with limited operator experience. The damage metrology tools include: (1) platinum inclusion damage test systems for laser amplifier slabs, (2) laser conditioning stations for mirrors and polarizers, and (3) mapping and damage testing stations for UV transmissive optics. Each system includes a commercial Nd:YAG laser, a translation stage for the optics, and diagnostics to evaluate damage. The scanning parameters, optical layout, and diagnostics vary with the test fluences required and the damage morphologies expected. This paper describes the technical objectives and milestones involved in fulfilling these metrology requirements

  15. venice: Mask utility

    Science.gov (United States)

    Coupon, Jean

    2018-02-01

    venice reads a mask file (DS9 or fits type) and a catalogue of objects (ascii or fits type) to create a pixelized mask, find objects inside/outside a mask, or generate a random catalogue of objects inside/outside a mask. The program reads the mask file and checks if a point, giving its coordinates, is inside or outside the mask, i.e. inside or outside at least one polygon of the mask.

  16. Laser damage in optical components: metrology, statistical and photo-induced analysis of precursor centres; Endommagement laser dans les composants optiques: metrologie, analyse statistique et photo-induite des sites initiateurs

    Energy Technology Data Exchange (ETDEWEB)

    Gallais, L

    2002-11-15

    This thesis deals with laser damage phenomena for nanosecond pulses, in optical components such as glasses, dielectric and metallic thin films. Firstly, a work is done on the laser damage metrology, in order to obtain accurate and reliable measurement of laser-induced damage probabilities, with a rigorous control of test parameters. Then, with the use of a specific model, we find densities of laser damage precursors in the case of bulk glasses (few tens by (100{mu}m){sup 3}) and in the case of glass surfaces (one precursor by {mu}m{sup 3}). Our analysis is associated to morphology studies by Atomic Force Microscope to discuss about precursor nature and damage process. Influence of wavelength (from 355 to 1064 nm) and cumulated shots is also studied. Simulations are performed to study initiation mechanisms on these inclusions. This work gives an estimation of complex index and size of the precursor, which permits to discuss about possible detection by non-destructive tools. (author)

  17. Color and appearance metrology facility

    Data.gov (United States)

    Federal Laboratory Consortium — The NIST Physical Measurement Laboratory has established the color and appearance metrology facility to support calibration services for 0°/45° colored samples, 20°,...

  18. A Roadmap for Thermal Metrology

    Science.gov (United States)

    Bojkovski, J.; Fischer, J.; Machin, G.; Pavese, F.; Peruzzi, A.; Renaot, E.; Tegeler, E.

    2009-02-01

    A provisional roadmap for thermal metrology was developed in Spring 2006 as part of the EUROMET iMERA activity toward increasing impact from national investment in European metrology R&D. This consisted of two parts: one addressing the influence of thermal metrology on society, industry, and science, and the other specifying the requirements of enabling thermal metrology to serve future needs. The roadmap represents the shared vision of the EUROMET TC Therm committee as to how thermal metrology should develop to meet future requirements over the next 15 years. It is important to stress that these documents are a first attempt to roadmap the whole of thermal metrology and will certainly need regular review and revision to remain relevant and useful to the community they seek to serve. The first part of the roadmap, “Thermal metrology for society, industry, and science,” identifies the main social and economic triggers driving developments in thermal metrology—notably citizen safety and security, new production technologies, environment and global climate change, energy, and health. Stemming from these triggers, key targets are identified that require improved thermal measurements. The second part of the roadmap, “Enabling thermal metrology to serve future needs” identifies another set of triggers, like global trade and interoperability, future needs in transport, and the earth radiation budget. Stemming from these triggers, key targets are identified, such as improved realizations and dissemination of the SI unit the kelvin, anchoring the kelvin to the Boltzmann constant, k B, and calculating thermal properties from first principles. To facilitate these outcomes, the roadmap identifies the technical advances required in thermal measurement standards.

  19. Gamma camera with reflectivity mask

    International Nuclear Information System (INIS)

    Stout, K.J.

    1980-01-01

    In accordance with the present invention there is provided a radiographic camera comprising: a scintillator; a plurality of photodectors positioned to face said scintillator; a plurality of masked regions formed upon a face of said scintillator opposite said photdetectors and positioned coaxially with respective ones of said photodetectors for decreasing the amount of internal reflection of optical photons generated within said scintillator. (auth)

  20. Joint Research on Scatterometry and AFM Wafer Metrology

    Science.gov (United States)

    Bodermann, Bernd; Buhr, Egbert; Danzebrink, Hans-Ulrich; Bär, Markus; Scholze, Frank; Krumrey, Michael; Wurm, Matthias; Klapetek, Petr; Hansen, Poul-Erik; Korpelainen, Virpi; van Veghel, Marijn; Yacoot, Andrew; Siitonen, Samuli; El Gawhary, Omar; Burger, Sven; Saastamoinen, Toni

    2011-11-01

    Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both experimental and modelling methods will be enhanced and different methods will be compared with each other and with specially adapted atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurement systems in measurement comparisons. Additionally novel methods for sophisticated data analysis will be developed and investigated to reach significant reductions of the measurement uncertainties in critical dimension (CD) metrology. One final goal will be the realisation of a wafer based reference standard material for calibration of scatterometers.

  1. PREFACE: Fundamental Constants in Physics and Metrology

    Science.gov (United States)

    Klose, Volkmar; Kramer, Bernhard

    1986-01-01

    This volume contains the papers presented at the 70th PTB Seminar which, the second on the subject "Fundamental Constants in Physics and Metrology", was held at the Physikalisch-Technische Bundesanstalt in Braunschweig from October 21 to 22, 1985. About 100 participants from the universities and various research institutes of the Federal Republic of Germany participated in the meeting. Besides a number of review lectures on various broader subjects there was a poster session which contained a variety of topical contributed papers ranging from the theory of the quantum Hall effect to reports on the status of the metrological experiments at the PTB. In addition, the participants were also offered the possibility to visit the PTB laboratories during the course of the seminar. During the preparation of the meeting we noticed that even most of the general subjects which were going to be discussed in the lectures are of great importance in connection with metrological experiments and should be made accessible to the scientific community. This eventually resulted in the idea of the publication of the papers in a regular journal. We are grateful to the editor of Metrologia for providing this opportunity. We have included quite a number of papers from basic physical research. For example, certain aspects of high-energy physics and quantum optics, as well as the many-faceted role of Sommerfeld's fine-structure constant, are covered. We think that questions such as "What are the intrinsic fundamental parameters of nature?" or "What are we doing when we perform an experiment?" can shed new light on the art of metrology, and do, potentially, lead to new ideas. This appears to be especially necessary when we notice the increasing importance of the role of the fundamental constants and macroscopic quantum effects for the definition and the realization of the physical units. In some cases we have reached a point where the limitations of our knowledge of a fundamental constant and

  2. EQ-10 electrodeless Z-pinch EUV source for metrology applications

    Science.gov (United States)

    Gustafson, Deborah; Horne, Stephen F.; Partlow, Matthew J.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

    2011-11-01

    With EUV Lithography systems shipping, the requirements for highly reliable EUV sources for mask inspection and resist outgassing are becoming better defined, and more urgent. The sources needed for metrology applications are very different than that needed for lithography; brightness (not power) is the key requirement. Suppliers for HVM EUV sources have all resources working on high power and have not entered the smaller market for metrology. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinchTM light source since 19951. The source is currently being used for metrology, mask inspection, and resist development2-4. These applications require especially stable performance in both output power and plasma size and position. Over the last 6 years Energetiq has made many source modifications which have included better thermal management to increase the brightness and power of the source. We now have introduced a new source that will meet requirements of some of the mask metrology first generation tools; this source will be reviewed.

  3. Status of EUVL mask development in Europe (Invited Paper)

    Science.gov (United States)

    Peters, Jan H.

    2005-06-01

    EUV lithography is the prime candidate for the next generation lithography technology after 193 nm immersion lithography. The commercial onset for this technology is expected for the 45 nm half-pitch technology or below. Several European and national projects and quite a large number of companies and research institutions in Europe work on various aspects of the technological challenges to make EUV a commercially viable technology in the not so far future. Here the development of EUV sources, the development of an EUV exposure tools, metrology tools dedicated for characterization of mask, the production of EUV mask blanks and the mask structuring itself are the key areas in which major activities can be found. In this talk we will primarily focus on those activities, which are related to establish an EUV mask supply chain with all its ingredients from substrate production, polishing, deposition of EUV layers, blank characterization, mask patterning process and the consecutive metrology and defect inspection as well as shipping and handling from blank supply to usage in the wafer fab. The EUV mask related projects on the national level are primarily supported by the French Ministry of Economics and Finance (MinEFi) and the German Ministry of Education and Research (BMBF).

  4. Economic benefits of metrology in manufacturing

    DEFF Research Database (Denmark)

    Savio, Enrico; De Chiffre, Leonardo; Carmignato, S.

    2016-01-01

    examples from industrial production, in which the added value of metrology in manufacturing is discussed and quantified. Case studies include: general manufacturing, forging, machining, and related metrology. The focus of the paper is on the improved effectiveness of metrology when used at product...... and process design stages, as well as on the improved accuracy and efficiency of manufacturing through better measuring equipment and process chains with integrated metrology for process control.......In streamlined manufacturing systems, the added value of inspection activities is often questioned, and metrology in particular is sometimes considered only as an avoidable expense. Documented quantification of economic benefits of metrology is generally not available. This work presents concrete...

  5. Quantum optics

    National Research Council Canada - National Science Library

    Agarwal, G. S

    2013-01-01

    ..., quantum metrology, spin squeezing, control of decoherence and many other key topics. Readers are guided through the principles of quantum optics and their uses in a wide variety of areas including quantum information science and quantum mechanics...

  6. Critical issues in overlay metrology

    International Nuclear Information System (INIS)

    Sullivan, Neal T.

    2001-01-01

    In this paper, following an overview of overlay metrology, the difficult relationship of overlay with device performance and yield is discussed and supported with several examples. This is followed by a discussion of the impending collision of metrology equipment performance and 'real' process tolerances for sub 0.18 um technologies. This convergence of tolerance and performance is demonstrated to lead to the current emergence of real-time overlay modeling in a feed-forward/feedback process environment and the associated metrology/sampling implications. This modeling takes advantage of the wealth of understanding concerning the systematic behavior of overlay registration errors. Finally, the impact of new process technologies (RET, OAI, CPSM, CMP, and etc.) on the measurement target is discussed and shown to de-stabilize overlay performance on standard overlay measurement target designs

  7. Dimensional micro and nano metrology

    DEFF Research Database (Denmark)

    Hansen, Hans Nørgaard; da Costa Carneiro, Kim; Haitjema, Han

    2006-01-01

    The need for dimensional micro and nano metrology is evident, and as critical dimensions are scaled down and geometrical complexity of objects is increased, the available technologies appear not sufficient. Major research and development efforts have to be undertaken in order to answer these chal......The need for dimensional micro and nano metrology is evident, and as critical dimensions are scaled down and geometrical complexity of objects is increased, the available technologies appear not sufficient. Major research and development efforts have to be undertaken in order to answer...... these challenges. The developments have to include new measuring principles and instrumentation, tolerancing rules and procedures as well as traceability and calibration. The current paper describes issues and challenges in dimensional micro and nano metrology by reviewing typical measurement tasks and available...

  8. Metrological Reliability of Medical Devices

    Science.gov (United States)

    Costa Monteiro, E.; Leon, L. F.

    2015-02-01

    The prominent development of health technologies of the 20th century triggered demands for metrological reliability of physiological measurements comprising physical, chemical and biological quantities, essential to ensure accurate and comparable results of clinical measurements. In the present work, aspects concerning metrological reliability in premarket and postmarket assessments of medical devices are discussed, pointing out challenges to be overcome. In addition, considering the social relevance of the biomeasurements results, Biometrological Principles to be pursued by research and innovation aimed at biomedical applications are proposed, along with the analysis of their contributions to guarantee the innovative health technologies compliance with the main ethical pillars of Bioethics.

  9. Celtiberian metrology and its romanization

    Directory of Open Access Journals (Sweden)

    Leonard A. CURCHIN

    2013-05-01

    Full Text Available Celtiberian metrology has scarcely been investigated until now, with the exception of coin weights. On the basis of measurements of pre-Roman mud bricks, a Celtiberian foot of 24 cm is proposed. With regard to weights, we can accept a module of 9 g for silver jewelry and some bronze coins; however, loom weights do not conform to any metrological system. Over time, Roman measures of length (as indicated by the dimensions of bricks, tiles and architectural monuments and weight were adopted.

  10. Metrological issues in molecular radiotherapy

    International Nuclear Information System (INIS)

    D'Arienzo, Marco; Capogni, Marco; Smyth, Vere; Cox, Maurice; Johansson, Lena; Bobin, Christophe

    2014-01-01

    The therapeutic effect from molecular radiation therapy (MRT), on both tumour and normal tissue, is determined by the radiation absorbed dose. Recent research indicates that as a consequence of biological variation across patients the absorbed dose can vary, for the same administered activity, by as much as two orders of magnitude. The international collaborative EURAMET-EMRP project Metrology for molecular radiotherapy (MetroMRT) is addressing this problem. The overall aim of the project is to develop methods of calibrating and verifying clinical dosimetry in MRT. In the present paper an overview of the metrological issues in molecular radiotherapy is provided. (authors)

  11. DLP-based 3D metrology by structured light or projected fringe technology for life sciences and industrial metrology

    Science.gov (United States)

    Frankowski, G.; Hainich, R.

    2009-02-01

    Since the mid-eighties, a fundamental idea for achieving measuring accuracy in projected fringe technology was to consider the projected fringe pattern as an interferogram and evaluate it on the basis of advanced algorithms widely used for phase measuring in real-time interferometry. A fundamental requirement for obtaining a sufficiently high degree of measuring accuracy with this so-called "phase measuring projected fringe technology" is that the projected fringes, analogous to interference fringes, must have a cos2-shaped intensity distribution. Until the mid-nineties, this requirement for the projected fringe pattern measurement technology presented a basic handicap for its wide application in 3D metrology. This situation changed abruptly, when in the nineties Texas Instruments introduced to the market advanced digital light projection on the basis of micro mirror based projection systems, socalled DLP technology, which also facilitated the generation and projection of cos2-shaped intensity and/or fringe patterns. With this DLP technology, which from its original approach was actually oriented towards completely different applications such as multimedia projection, Texas Instruments boosted phase-measuring fringe projection in optical 3D metrology to a worldwide breakthrough both for medical as well as industrial applications. A subject matter of the lecture will be to present the fundamental principles and the resulting advantages of optical 3D metrology based on phase-measuring fringe projection using DLP technology. Further will be presented and discussed applications of the measurement technology in medical engineering and industrial metrology.

  12. Visual masking & schizophrenia

    Directory of Open Access Journals (Sweden)

    Michael H. Herzog

    2015-06-01

    Full Text Available Visual masking is a frequently used tool in schizophrenia research. Visual masking has a very high sensitivity and specificity and masking paradigms have been proven to be endophenotypes. Whereas masking is a powerful technique to study schizophrenia, the underlying mechanisms are discussed controversially. For example, for more than 25 years, masking deficits of schizophrenia patients were mainly attributed to a deficient magno-cellular system (M-system. Here, we show that there is very little evidence that masking deficits are magno-cellular deficits. We will discuss the magno-cellular and other approaches in detail and highlight their pros and cons.

  13. Neutron metrology in the HFR

    International Nuclear Information System (INIS)

    Kraakman, R.; Voorbraak, W.P.

    1993-04-01

    Additional to the in-core EXOTIC experiments, six irradiations of ceramic material, R212-001 to R212-006, have been performed in the PSF of the HFR. This note presents the neutron metrology results for these irradiations. (orig.)

  14. Binaural masking level differences in nonsimultanuous masking

    NARCIS (Netherlands)

    Kohlrausch, A.G.; Fassel, R.; Gilkey, R.H.; Anderson, T.R.

    1997-01-01

    This chapter investigates the extent to which binaural unmasking occurs with nonsimultaneous presentation of masker and signal, particularly in forward masking. The majority of previous studies that addressed this question found that there is a substantial binaural masking level difference (BMLD) in

  15. Metrology and ionospheric observation standards

    Science.gov (United States)

    Panshin, Evgeniy; Minligareev, Vladimir; Pronin, Anton

    Accuracy and ionospheric observation validity are urgent trends nowadays. WMO, URSI and national metrological and standardisation services bring forward requirements and descriptions of the ionospheric observation means. Researches in the sphere of metrological and standardisation observation moved to the next level in the Russian Federation. Fedorov Institute of Applied Geophysics (IAG) is in charge of ionospheric observation in the Russian Federation and the National Technical Committee, TC-101 , which was set up on the base of IAG- of the standardisation in the sphere. TC-101 can be the platform for initiation of the core international committee in the network of ISO The new type of the ionosounde “Parus-A” is engineered, which is up to the national requirements. “Parus-A” calibration and test were conducted by National metrological Institute (NMI) -D.I. Mendeleyev Institute for Metrology (VNIIM), signed CIMP MRA in 1991. VNIIM is a basic NMI in the sphere of Space weather (including ionospheric observations), the founder of which was celebrated chemist and metrologist Dmitriy I. Mendeleyev. Tests and calibration were carried out for the 1st time throughout 50-year-history of ionosonde exploitation in Russia. The following metrological characteristics were tested: -measurement range of radiofrequency time delay 0.5-10 ms; -time measurement inaccuracy of radio- frequency pulse ±12mcs; -frequency range of radio impulse 1-20 MHz ; -measurement inaccuracy of radio impulse carrier frequency± 5KHz. For example, the sound impulse simulator that was built-in in the ionosounde was used for measurement range of radiofrequency time delay testing. The number of standards on different levels is developed. - “Ionospheric observation guidance”; - “The Earth ionosphere. Terms and definitions”.

  16. Surface Slope Metrology on Deformable Soft X-ray Mirrors

    International Nuclear Information System (INIS)

    Yuan, Sheng; Yashchuk, Valeriy V.; Goldberg, Kenneth A.; Celestre, Rich; Church, Matthew; McKinney, Wayne R.; Morrison, Greg; Warwick, Tony

    2010-01-01

    We report on the current state of surface slope metrology on deformable mirrors for soft x-rays at the Advanced Light Source (ALS). While we are developing techniques for in situ at-wavelength tuning, we are refining methods of ex situ visible-light optical metrology to achieve sub-100-nrad accuracy. This paper reports on laboratory studies, measurements and tuning of a deformable test-KB mirror prior to its use. The test mirror was bent to a much different optical configuration than its original design, achieving a 0.38 micro-radian residual slope error. Modeling shows that in some cases, by including the image conjugate distance as an additional free parameter in the alignment, along with the two force couples, fourth-order tangential shape errors (the so-called bird shape) can be reduced or eliminated.

  17. Surface Slope Metrology on Deformable Soft X-ray Mirrors

    International Nuclear Information System (INIS)

    Yuan, S.; Yashchuk, V.V.; Goldberg, K.A.; Celestre, R.; Church, M.; McKinney, W.R.; Morrison, G.; Warwick, T.

    2009-01-01

    We report on the current state of surface slope metrology on deformable mirrors for soft x-rays at the Advanced Light Source (ALS). While we are developing techniques for in situ at-wavelength tuning, we are refining methods of ex situvisible-light optical metrology to achieve sub-100-nrad accuracy. This paper reports on laboratory studies, measurements and tuning of a deformable test-KB mirror prior to its use. The test mirror was bent to a much different optical configuration than its original design, achieving a 0.38 micro-radian residual slope error. Modeling shows that in some cases, by including the image conjugate distance as an additional free parameter in the alignment, along with the two force couples, fourth-order tangential shape errors (the so-called bird shape) can be reduced or eliminated.

  18. Plant equipment services with laser metrology

    International Nuclear Information System (INIS)

    Hayes, J.H.; Kreitman, P.J.

    1995-01-01

    A new industrial metrology process is now being applied to support PWR Nuclear Plant Steam Generator Replacement Projects. The method uses laser tracking interferometry to perform as built surveys of existing and replacement plant equipment. This method provides precision data with a minimum of setup when compared to alternative methods available. In addition there is no post processing required to ascertain validity. The data is obtained quickly, processed in real time and displayed during the survey in the desired coordinate system. These capabilities make this method of industrial measure ideal for various data acquisition needs throughout the power industry, from internal/external equipment templating to area mapping. Laser tracking interferometry is an improvement on the present use of optical instruments and surveying technique. In order to describe the laser tracking interferometry measurement process, previous methods of templating and surveying are first reviewed

  19. TSOM Method for Nanoelectronics Dimensional Metrology

    International Nuclear Information System (INIS)

    Attota, Ravikiran

    2011-01-01

    Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquiring and analyzing a set of optical images collected at various focus positions going through focus (from above-focus to under-focus). The measurement resolution is comparable to what is possible with typical light scatterometry, scanning electron microscopy (SEM) and atomic force microscopy (AFM). TSOM method is able to identify nanometer scale difference, type of the difference and magnitude of the difference between two nano/micro scale targets using a conventional optical microscope with visible wavelength illumination. Numerous industries could benefit from the TSOM method--such as the semiconductor industry, MEMS, NEMS, biotechnology, nanomanufacturing, data storage, and photonics. The method is relatively simple and inexpensive, has a high throughput, provides nanoscale sensitivity for 3D measurements and could enable significant savings and yield improvements in nanometrology and nanomanufacturing. Potential applications are demonstrated using experiments and simulations.

  20. Overlay improvement methods with diffraction based overlay and integrated metrology

    Science.gov (United States)

    Nam, Young-Sun; Kim, Sunny; Shin, Ju Hee; Choi, Young Sin; Yun, Sang Ho; Kim, Young Hoon; Shin, Si Woo; Kong, Jeong Heung; Kang, Young Seog; Ha, Hun Hwan

    2015-03-01

    To accord with new requirement of securing more overlay margin, not only the optical overlay measurement is faced with the technical limitations to represent cell pattern's behavior, but also the larger measurement samples are inevitable for minimizing statistical errors and better estimation of circumstance in a lot. From these reasons, diffraction based overlay (DBO) and integrated metrology (IM) were mainly proposed as new approaches for overlay enhancement in this paper.

  1. Masks in Pedagogical Practice

    Science.gov (United States)

    Roy, David

    2016-01-01

    In Drama Education mask work is undertaken and presented as both a methodology and knowledge base. There are numerous workshops and journal articles available for teachers that offer knowledge or implementation of mask work. However, empirical examination of the context or potential implementation of masks as a pedagogical tool remains…

  2. Keeping African Masks Real

    Science.gov (United States)

    Waddington, Susan

    2012-01-01

    Art is a good place to learn about our multicultural planet, and African masks are prized throughout the world as powerfully expressive artistic images. Unfortunately, multicultural education, especially for young children, can perpetuate stereotypes. Masks taken out of context lose their meaning and the term "African masks" suggests that there is…

  3. AWRE (nonconventional) metrology scene

    International Nuclear Information System (INIS)

    West, F.L.

    1978-01-01

    Progress at AWRE in the adaptation of optical interferometry to contour and thickness measurement arising with two-dimensional shell and metal mirror parts is described. The primary aim is to outline various inspection problems encountered with use of rotary contour gauges in order to illustrate reasons for the direction of development and to invite comment on proposed solutions. Surface finish of machined parts is seen as a linked problem bearing directly on determination accuracy and repeatability of measurement. A clearer understanding of surface topography and its measurement is being sought as a necessary adjunct to precision inspection of conventional parts and to guide tooling development in mirror manufacture

  4. Fast mask writers: technology options and considerations

    Science.gov (United States)

    Litt, Lloyd C.; Groves, Timothy; Hughes, Greg

    2011-04-01

    The semiconductor industry is under constant pressure to reduce production costs even as the complexity of technology increases. Lithography represents the most expensive process due to its high capital equipment costs and the implementation of low-k1 lithographic processes, which have added to the complexity of making masks because of the greater use of optical proximity correction, pixelated masks, and double or triple patterning. Each of these mask technologies allows the production of semiconductors at future nodes while extending the utility of current immersion tools. Low-k1 patterning complexity combined with increased data due to smaller feature sizes is driving extremely long mask write times. While a majority of the industry is willing to accept times of up to 24 hours, evidence suggests that the write times for many masks at the 22 nm node and beyond will be significantly longer. It has been estimated that funding on the order of 50M to 90M for non-recurring engineering (NRE) costs will be required to develop a multiple beam mask writer system, yet the business case to recover this kind of investment is not strong. Moreover, funding such a development poses a high risk for an individual supplier. The structure of the mask fabrication marketplace separates the mask writer equipment customer (the mask supplier) from the final customer (wafer manufacturer) that will be most effected by the increase in mask cost that will result if a high speed mask writer is not available. Since no individual company will likely risk entering this market, some type of industry-wide funding model will be needed.

  5. Three-lambda metrology

    Science.gov (United States)

    Pfoertner, Andreas; Schwider, Johannes

    2002-06-01

    The state-of-the-art technique for measuring discontinuous surface profiles, e.g. diffractive optical elements (DOE) is white-light interferometry. Compared to single wavelength phase-shifting interferometry conventional white-light-interferometry is rather slow, because the number of frames to be evaluated is about ten times greater than in phase-shifting-interferometry. Therefore white-light-interferometry needs more memory capacity and computer time. Single wavelength phase-shifting interferometry cannot be used for the mentioned task since the order of the interference fringes cannot be determined. But if three wavelengths, e.g. a red, a green, and a blue one are used which preferably have no common factor it is possible to determine the interference order of the fringes or the absolute optical path difference (OPD) of the interferometer. The interference patterns are simultaneously recorded by a color CCD-camera having 3 separate chips. The OPD is calculated for each pixel from the three phase values mod 2π . The algorithms used and experimental results will be presented.

  6. 8th Brazilian Congress on Metrology (Metrologia 2015)

    International Nuclear Information System (INIS)

    2016-01-01

    THE EIGHTH BRAZILIAN CONGRESS ON METROLOGY (METROLOGIA 2015) The United Nations celebrated 2015 as the International Year of Light. By a curious coincidence, many notable events in science and technology completed a multiple of 50 or 100 years in 2015. From the pioneering work of the wise Ibn Al-Haytham in 1015, through Fresnel, Maxwell, Einstein, the discovery of the cosmic microwave background, to the use of optical fibres in communications in 1965. Electromagnetic radiation is present in our daily lives in countless applications. It is remarkable that there is no way to think about these applications without thinking of measurements. From entangled photons to more prosaic public illumination of our daily life, we are intrinsically connected all the time with the luminous phenomena. Among other things, the light allows global communication on a large scale. It strengthens the internationalization of production processes, which brings considerable changes in relations, processes and economic structures, as well as it orients the social, political and cultural behaviour of any country. These conditions of this internationalization require interchangeability of parts of complex systems, translated into strict adherence to the standards and specifications that use increasingly accurate measurement techniques, as well as the growing demand from consumer markets for products and higher quality services. They also require innovation and improvements in domestic production to boost the competitiveness of industries in domestic and foreign markets. Thus, if the Science of Measurements is taken as a serious concern, countries are better prepared to evolve towards economic and social development. In this 8"t"h edition of the Brazilian Congress on Metrology (METROLOGIA 2015), in addition to the thematic sessions in various areas of Metrology and Conformity Assessment, we hold several satellite events. They are already traditional events or highlight important current issues

  7. Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

    Science.gov (United States)

    Banke, Bill, Jr.; Archie, Charles N.; Sendelbach, Matthew; Robert, Jim; Slinkman, James A.; Kaszuba, Phil; Kontra, Rick; DeVries, Mick; Solecky, Eric P.

    2004-05-01

    Perhaps never before in semiconductor microlithography has there been such an interest in the accuracy of measurement. This interest places new demands on our in-line metrology systems as well as the supporting metrology for verification. This also puts a burden on the users and suppliers of new measurement tools, which both challenge and complement existing manufacturing metrology. The metrology community needs to respond to these challenges by using new methods to assess the fab metrologies. An important part of this assessment process is the ability to obtain accepted reference measurements as a way of determining the accuracy and Total Measurement Uncertainty (TMU) of an in-line critical dimension (CD). In this paper, CD can mean any critical dimension including, for example, such measures as feature height or sidewall angle. This paper describes the trade-offs of in-line metrology systems as well as the limitations of Reference Measurement Systems (RMS). Many factors influence each application such as feature shape, material properties, proximity, sampling, and critical dimension. These factors, along with the metrology probe size, interaction volume, and probe type such as e-beam, optical beam, and mechanical probe, are considered. As the size of features shrinks below 100nm some of the stalwarts of reference metrology come into question, such as the electrically determined transistor gate length. The concept of the RMS is expanded to show how multiple metrologies are needed to achieve the right balance of accuracy and sampling. This is also demonstrated for manufacturing metrology. Various comparisons of CDSEM, scatterometry, AFM, cross section SEM, electrically determined CDs, and TEM are shown. An example is given which demonstrates the importance in obtaining TMU by balancing accuracy and precision for selecting manufacturing measurement strategy and optimizing manufacturing metrology. It is also demonstrated how the necessary supporting metrology will

  8. 2013 mask industry survey

    Science.gov (United States)

    Malloy, Matt

    2013-09-01

    A comprehensive survey was sent to merchant and captive mask shops to gather information about the mask industry as an objective assessment of its overall condition. 2013 marks the 12th consecutive year for this process. Historical topics including general mask profile, mask processing, data and write time, yield and yield loss, delivery times, maintenance, and returns were included and new topics were added. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. While each year's survey includes minor updates based on feedback from past years and the need to collect additional data on key topics, the bulk of the survey and reporting structure have remained relatively constant. A series of improvements is being phased in beginning in 2013 to add value to a wider audience, while at the same time retaining the historical content required for trend analyses of the traditional metrics. Additions in 2013 include topics such as top challenges, future concerns, and additional details in key aspects of mask masking, such as the number of masks per mask set per ground rule, minimum mask resolution shipped, and yield by ground rule. These expansions beyond the historical topics are aimed at identifying common issues, gaps, and needs. They will also provide a better understanding of real-life mask requirements and capabilities for comparison to the International Technology Roadmap for Semiconductors (ITRS).

  9. Phase mask coronagraphy at JPL and Palomar

    Directory of Open Access Journals (Sweden)

    Serabyn E.

    2011-07-01

    Full Text Available For the imaging of faint companions, phase mask coronagraphy has the dual advantages of a small inner working angle and high throughput. This paper summarizes our recent work in developing phase masks and in demonstrating their capabilities at JPL. Four-quadrant phase masks have been manufactured at JPL by means of both evaporation and etching, and we have been developing liquid crystal vortex phase masks in partnership with a commercial vendor. Both types of mask have been used with our extreme adaptive optics well-corrected subaperture at Palomar to detect known brown dwarf companions as close as ~ 2.5 λ/D to stars. Moreover, our recent vortex masks perform very well in laboratory tests, with a demonstrated infrared contrast of about 10−6 at 3 λ/D, and contrasts of a few 10−7 with an initial optical wavelength device. The demonstrated performance already meets the needs of ground-based extreme adaptive optics coronagraphy, and further planned improvements are aimed at reaching the 10−10 contrast needed for terrestrial exoplanet detection with a space-based coronagraph.

  10. Clean focus, dose and CD metrology for CD uniformity improvement

    Science.gov (United States)

    Lee, Honggoo; Han, Sangjun; Hong, Minhyung; Kim, Seungyoung; Lee, Jieun; Lee, DongYoung; Oh, Eungryong; Choi, Ahlin; Kim, Nakyoon; Robinson, John C.; Mengel, Markus; Pablo, Rovira; Yoo, Sungchul; Getin, Raphael; Choi, Dongsub; Jeon, Sanghuck

    2018-03-01

    Lithography process control solutions require more exacting capabilities as the semiconductor industry goes forward to the 1x nm node DRAM device manufacturing. In order to continue scaling down the device feature sizes, critical dimension (CD) uniformity requires continuous improvement to meet the required CD error budget. In this study we investigate using optical measurement technology to improve over CD-SEM methods in focus, dose, and CD. One of the key challenges is measuring scanner focus of device patterns. There are focus measurement methods based on specially designed marks on scribe-line, however, one issue of this approach is that it will report focus of scribe line which is potentially different from that of the real device pattern. In addition, scribe-line marks require additional design and troubleshooting steps that add complexity. In this study, we investigated focus measurement directly on the device pattern. Dose control is typically based on using the linear correlation behavior between dose and CD. The noise of CD measurement, based on CD-SEM for example, will not only impact the accuracy, but also will make it difficult to monitor dose signature on product wafers. In this study we will report the direct dose metrology result using an optical metrology system which especially enhances the DUV spectral coverage to improve the signal to noise ratio. CD-SEM is often used to measure CD after the lithography step. This measurement approach has the advantage of easy recipe setup as well as the flexibility to measure critical feature dimensions, however, we observe that CD-SEM metrology has limitations. In this study, we demonstrate within-field CD uniformity improvement through the extraction of clean scanner slit and scan CD behavior by using optical metrology.

  11. Advanced defect classification by optical metrology

    NARCIS (Netherlands)

    Maas, D.J.

    2017-01-01

    The goal of the workshop is to provide a high level, invited only, international community that accelerates interactions between the main target groups: universities, institutes, entrepreneurs, intrapreneurs and investors in order to facilitate customer development, application discovery or funding

  12. Metrology and quality control handbook

    International Nuclear Information System (INIS)

    Hofmann, D.

    1983-01-01

    This book tries to present the fundamentals of metrology and quality control in brief surveys. Compromises had to be made in order to reduce the material available to a sensible volume for the sake of clarity. This becomes evident by the following two restrictions which had to made: First, in dealing with the theoretical principles of metrology and quality control, mere reference had to be made in many cases to the great variety of special literature without discussing it to explain further details. Second, in dealing with the application of metrology and quality control techniques in practice, only the basic qantities of the International System of Units (SI) could be taken into account as a rule. Some readers will note that many special measuring methods and equipment known to them are not included in this book. I do hope, however, that this short-coming will show to have a positive effect, too. This book will show the reader how to find the basic quantities and units from the derived quantities and units, and the steps that are necessary to solve any kind of measuring task. (orig./RW) [de

  13. Metrology at Philip Morris Europe

    Directory of Open Access Journals (Sweden)

    Gualandris R

    2014-12-01

    Full Text Available The importance of the metrology function at Philip Morris Europe (PME, a multinational organisation producing at over 40 sites in the European, Middle Eastern and African Regions is presented. Standardisation of test methods and equipment as well as the traceability of calibration gauges to the same reference gauge are essential in order to obtain comparable results among the various production centers. The metrology function as well as the qualification of instruments and the drafting of test and calibration operating procedures for this region are conducted or co-ordinated by the Research and Development Department in Neuchatel, Switzerland. In this paper the metrology function within PME is presented based on the measurement of the resistance to draw for which the PME R&D laboratory is accredited (ISO/CEI 17025, as both a calibration and a testing laboratory. The following topics are addressed in this paper: traceability of calibration standards to national standards; comparison of results among manufacturing centres; the choice, the budget as well as the computation of uncertainties. Furthermore, some practical aspects related to the calibration and use of the glass multicapillary gauges are discussed.

  14. Flexible resources for quantum metrology

    Science.gov (United States)

    Friis, Nicolai; Orsucci, Davide; Skotiniotis, Michalis; Sekatski, Pavel; Dunjko, Vedran; Briegel, Hans J.; Dür, Wolfgang

    2017-06-01

    Quantum metrology offers a quadratic advantage over classical approaches to parameter estimation problems by utilising entanglement and nonclassicality. However, the hurdle of actually implementing the necessary quantum probe states and measurements, which vary drastically for different metrological scenarios, is usually not taken into account. We show that for a wide range of tasks in metrology, 2D cluster states (a particular family of states useful for measurement-based quantum computation) can serve as flexible resources that allow one to efficiently prepare any required state for sensing, and perform appropriate (entangled) measurements using only single qubit operations. Crucially, the overhead in the number of qubits is less than quadratic, thus preserving the quantum scaling advantage. This is ensured by using a compression to a logarithmically sized space that contains all relevant information for sensing. We specifically demonstrate how our method can be used to obtain optimal scaling for phase and frequency estimation in local estimation problems, as well as for the Bayesian equivalents with Gaussian priors of varying widths. Furthermore, we show that in the paradigmatic case of local phase estimation 1D cluster states are sufficient for optimal state preparation and measurement.

  15. Flexible resources for quantum metrology

    International Nuclear Information System (INIS)

    Friis, Nicolai; Orsucci, Davide; Skotiniotis, Michalis; Sekatski, Pavel; Dunjko, Vedran; Briegel, Hans J; Dür, Wolfgang

    2017-01-01

    Quantum metrology offers a quadratic advantage over classical approaches to parameter estimation problems by utilising entanglement and nonclassicality. However, the hurdle of actually implementing the necessary quantum probe states and measurements, which vary drastically for different metrological scenarios, is usually not taken into account. We show that for a wide range of tasks in metrology, 2D cluster states (a particular family of states useful for measurement-based quantum computation) can serve as flexible resources that allow one to efficiently prepare any required state for sensing, and perform appropriate (entangled) measurements using only single qubit operations. Crucially, the overhead in the number of qubits is less than quadratic, thus preserving the quantum scaling advantage. This is ensured by using a compression to a logarithmically sized space that contains all relevant information for sensing. We specifically demonstrate how our method can be used to obtain optimal scaling for phase and frequency estimation in local estimation problems, as well as for the Bayesian equivalents with Gaussian priors of varying widths. Furthermore, we show that in the paradigmatic case of local phase estimation 1D cluster states are sufficient for optimal state preparation and measurement. (paper)

  16. The metrology of time.

    Science.gov (United States)

    Arias, Elisa Felicitas

    2005-09-15

    Measuring time is a continuous activity, an international and restless enterprise hidden in time laboratories spread all over the planet. The Bureau International des Poids et Mesures is charged with coordinating activities for international timekeeping and it makes use of the world's capacity to produce a remarkably stable and accurate reference time-scale. Commercial atomic clocks beating the second in national laboratories can reach a stability of one part in 10(14) over a 5 day averaging time, compelling us to research the most highly performing methods of remote clock comparison. The unit of the international time-scale is the second of the International System of Units, realized with an uncertainty of the order 10(-15) by caesium fountains. Physicists in a few time laboratories are making efforts to gain one order of magnitude in the uncertainty of the realization of the second, and more refined techniques of time and frequency transfer are in development to accompany this progress. Femtosecond comb technology will most probably contribute in the near future to enhance the definition of the second with the incorporation of optical clocks. We will explain the evolution of the measuring of time, current state-of-the-art measures and future challenges.

  17. Improving Metrological Reliability of Information-Measuring Systems Using Mathematical Modeling of Their Metrological Characteristics

    Science.gov (United States)

    Kurnosov, R. Yu; Chernyshova, T. I.; Chernyshov, V. N.

    2018-05-01

    The algorithms for improving the metrological reliability of analogue blocks of measuring channels and information-measuring systems are developed. The proposed algorithms ensure the optimum values of their metrological reliability indices for a given analogue circuit block solution.

  18. Leaf area estimation of medium size plants using optical metrology Estimativa da área foliar de plantas de médio porte com metrologia óptica

    Directory of Open Access Journals (Sweden)

    Kleber M. Ribeiro

    2013-06-01

    Full Text Available The total leaf area (TLA estimation is an important feature of the crops and their assessment a challenge, since the direct methods of obtaining it are destructive and time consuming. Non-destructive methods have been explored to obtain the TLA by indirect approaches, in turn creating other features, as the leaf area index. The development of non-destructive technology to access the TLA of a plant has been the subject of much research, and the optical metrology is an promising approach. In this work, some indirect methods associated with optical approaches were evaluated as an alternative to obtain the TLA of the coffee plant. Commercial equipment were used, such as a camera with a fish eye lens and lux meters, associated to the sizes of the canopies were tested and compared to another non-destructive method and with methods proposed in the literature. The association between production and the TLA estimated was also evaluated. The results showed that the commercial equipment, generally used in forestry, was not the best approach in coffee plants, and that the methods related to the size and lux values of the plants were the best alternatives to estimate the TLA of the coffee plant.A estimativa da área foliar total (AFT é uma importante característica das culturas cuja avaliação é um desafio visto que métodos diretos de obtê-la são destrutivos e consome tempo. Métodos não destrutivos têm sido explorados com vista a se obter a AFT por meio de abordagens indiretas e, por sua vez, a criação de outros recursos, como o índice de área foliar. O desenvolvimento de tecnologia não destrutiva para acessar a AFT de uma planta tem sido objeto de muitas pesquisas e a metrologia óptica é uma abordagem promissora. Neste trabalho alguns métodos indiretos associados com as abordagens ópticas foram avaliados como alternativa para obtenção da AFT do cafeeiro. Equipamentos comerciais foram usados, como uma câmera com lente olho de peixe e

  19. System for automatic gauge block length measurement optimized for secondary length metrology

    Czech Academy of Sciences Publication Activity Database

    Buchta, Zdeněk; Šarbort, Martin; Čížek, Martin; Hucl, Václav; Řeřucha, Šimon; Pikálek, Tomáš; Dvořáčková, Š.; Dvořáček, F.; Kůr, J.; Konečný, P.; Weigl, M.; Lazar, Josef; Číp, Ondřej

    2017-01-01

    Roč. 49, JULY (2017), s. 322-331 ISSN 0141-6359 R&D Projects: GA TA ČR(CZ) TA03010663; GA MŠk(CZ) LO1212; GA MŠk ED0017/01/01 Institutional support: RVO:68081731 Keywords : low-coherence interferometry * laser interferometry * Gauge block * metrology Subject RIV: BH - Optics, Masers, Laser s OBOR OECD: Optics (including laser optics and quantum optics) Impact factor: 2.237, year: 2016

  20. Remote metrology system (RMS) design concept

    International Nuclear Information System (INIS)

    1995-01-01

    A 3D remote metrology system (RMS) is needed to map the interior plasma-facing components of the International Thermonuclear Experimental Reactor (ITER). The performance and survival of these components within the reactor vessel are strongly dependent on their precise alignment and positioning with respect to the plasma edge. Without proper positioning and alignment, plasma-facing surfaces will erode rapidly. A RMS design involving Coleman Research Corporation (CRC) fiber optic coherent laser radar (CLR) technology is examined in this study. The fiber optic CLR approach was selected because its high precision should be able to meet the ITER 0.1 mm accuracy requirement and because the CLR's fiber optic implementation allows a 3D scanner to operate remotely from the RMS system's vulnerable components. This design study has largely verified that a fiber optic CLR based RMS can survive the ITER environment and map the ITER interior at the required accuracy at a one measurement/cm 2 density with a total measurement time of less than one hour from each of six or more vertically deployed measurement probes. The design approach employs a sealed and pressurized measurement probe which is attached with an umbilical spiral bellows conduit. This conduit bears fiber optic and electronic links plus a stream of air to lower the temperature in the interior of the probe. Lowering the probe temperature is desirable because probe electromechanical components which could survive the radiation environment often were not rated for the 200 C temperature. The tip of the probe whose outer shell has a flexible bellows joint can swivel in two degrees of freedom to allow mapping operations at each probe deployment level. This design study has concluded that the most successful scanner design will involve a hybrid AO beam deflector and mechanical scanner

  1. Remote metrology system (RMS) design concept

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1995-10-19

    A 3D remote metrology system (RMS) is needed to map the interior plasma-facing components of the International Thermonuclear Experimental Reactor (ITER). The performance and survival of these components within the reactor vessel are strongly dependent on their precise alignment and positioning with respect to the plasma edge. Without proper positioning and alignment, plasma-facing surfaces will erode rapidly. A RMS design involving Coleman Research Corporation (CRC) fiber optic coherent laser radar (CLR) technology is examined in this study. The fiber optic CLR approach was selected because its high precision should be able to meet the ITER 0.1 mm accuracy requirement and because the CLR`s fiber optic implementation allows a 3D scanner to operate remotely from the RMS system`s vulnerable components. This design study has largely verified that a fiber optic CLR based RMS can survive the ITER environment and map the ITER interior at the required accuracy at a one measurement/cm{sup 2} density with a total measurement time of less than one hour from each of six or more vertically deployed measurement probes. The design approach employs a sealed and pressurized measurement probe which is attached with an umbilical spiral bellows conduit. This conduit bears fiber optic and electronic links plus a stream of air to lower the temperature in the interior of the probe. Lowering the probe temperature is desirable because probe electromechanical components which could survive the radiation environment often were not rated for the 200 C temperature. The tip of the probe whose outer shell has a flexible bellows joint can swivel in two degrees of freedom to allow mapping operations at each probe deployment level. This design study has concluded that the most successful scanner design will involve a hybrid AO beam deflector and mechanical scanner.

  2. Laser source for dimensional metrology: investigation of an iodine stabilized system based on narrow linewidth 633 nm DBR diode

    Czech Academy of Sciences Publication Activity Database

    Řeřucha, Šimon; Yacoot, A.; Pham, Minh Tuan; Čížek, Martin; Hucl, Václav; Lazar, Josef; Číp, Ondřej

    2017-01-01

    Roč. 28, č. 4 (2017), s. 1-11, č. článku 045204. ISSN 0957-0233 R&D Projects: GA ČR GB14-36681G; GA MŠk(CZ) LO1212; GA MŠk ED0017/01/01; GA TA ČR TE01020233 Institutional support: RVO:68081731 Keywords : optical metrology * DBR laser diode * frequency stabilization * laser interferometry * dimensional metrology * iodine stabilization * displacement measurement Subject RIV: BH - Optics, Masers, Lasers OBOR OECD: Optics (including laser optics and quantum optics) Impact factor: 1.585, year: 2016

  3. Metrology for industrial quantum communications: the MIQC project

    Science.gov (United States)

    Rastello, M. L.; Degiovanni, I. P.; Sinclair, A. G.; Kück, S.; Chunnilall, C. J.; Porrovecchio, G.; Smid, M.; Manoocheri, F.; Ikonen, E.; Kubarsepp, T.; Stucki, D.; Hong, K. S.; Kim, S. K.; Tosi, A.; Brida, G.; Meda, A.; Piacentini, F.; Traina, P.; Natsheh, A. Al; Cheung, J. Y.; Müller, I.; Klein, R.; Vaigu, A.

    2014-12-01

    The ‘Metrology for Industrial Quantum Communication Technologies’ project (MIQC) is a metrology framework that fosters development and market take-up of quantum communication technologies and is aimed at achieving maximum impact for the European industry in this area. MIQC is focused on quantum key distribution (QKD) technologies, the most advanced quantum-based technology towards practical application. QKD is a way of sending cryptographic keys with absolute security. It does this by exploiting the ability to encode in a photon's degree of freedom specific quantum states that are noticeably disturbed if an eavesdropper trying to decode it is present in the communication channel. The MIQC project has started the development of independent measurement standards and definitions for the optical components of QKD system, since one of the perceived barriers to QKD market success is the lack of standardization and quality assurance.

  4. Reflective masks for extreme ultraviolet lithography

    Energy Technology Data Exchange (ETDEWEB)

    Nguyen, Khanh Bao [Univ. of California, Berkeley, CA (United States)

    1994-05-01

    Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 μm wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.

  5. Tools intented to nuclear metrology

    International Nuclear Information System (INIS)

    Munayco Tasayco, A.F.

    1980-08-01

    The study undertaken in the metrological laboratory of the C.E.N. Saclay Electronics Services is intended to improve the measurement methods in two fields concerning nuclear instrumentation: the current's measurement in the range 1pA to 0,01 pA and the study of a measurement's system for the linear circuits used in spectrometer gamma ray with semiconductor. Two systems are now working. Its permit an improvement of precision measurement, an automation of the measurement process and many possibilities in the choice of parameters and the laying-out of results [fr

  6. Primary calibration in acoustics metrology

    International Nuclear Information System (INIS)

    Milhomem, T A Bacelar; Soares, Z M Defilippo

    2015-01-01

    SI unit in acoustics is realized by the reciprocity calibrations of laboratory standard microphones in pressure field, free field and diffuse field. Calibrations in pressure field and in free field are already consolidated and the Inmetro already done them. Calibration in diffuse field is not yet consolidated, however, some national metrology institutes, including Inmetro, are conducting researches on this subject. This paper presents the reciprocity calibration, the results of Inmetro in recent key comparisons and the research that is being developed for the implementation of reciprocity calibration in diffuse field

  7. A pattern-based method to automate mask inspection files

    Science.gov (United States)

    Kamal Baharin, Ezni Aznida Binti; Muhsain, Mohamad Fahmi Bin; Ahmad Ibrahim, Muhamad Asraf Bin; Ahmad Noorhani, Ahmad Nurul Ihsan Bin; Sweis, Jason; Lai, Ya-Chieh; Hurat, Philippe

    2017-03-01

    Mask inspection is a critical step in the mask manufacturing process in order to ensure all dimensions printed are within the needed tolerances. This becomes even more challenging as the device nodes shrink and the complexity of the tapeout increases. Thus, the amount of measurement points and their critical dimension (CD) types are increasing to ensure the quality of the mask. In addition to the mask quality, there is a significant amount of manpower needed when the preparation and debugging of this process are not automated. By utilizing a novel pattern search technology with the ability to measure and report match region scan-line (edge) measurements, we can create a flow to find, measure and mark all metrology locations of interest and provide this automated report to the mask shop for inspection. A digital library is created based on the technology product and node which contains the test patterns to be measured. This paper will discuss how these digital libraries will be generated and then utilized. As a time-critical part of the manufacturing process, this can also reduce the data preparation cycle time, minimize the amount of manual/human error in naming and measuring the various locations, reduce the risk of wrong/missing CD locations, and reduce the amount of manpower needed overall. We will also review an example pattern and how the reporting structure to the mask shop can be processed. This entire process can now be fully automated.

  8. Opportunities and Risks in Semiconductor Metrology

    Science.gov (United States)

    Borden, Peter

    2005-09-01

    New metrology opportunities are constantly emerging as the semiconductor industry attempts to meet scaling requirements. The paper summarizes some of the key FEOL and BEOL needs. These must be weighed against a number of considerations to ensure that they are good opportunities for the metrology equipment supplier. The paper discusses some of these considerations.

  9. Laboratorio de Metrología - LABM

    OpenAIRE

    Jaramillo Ch., Zaira J.

    2011-01-01

    esos y transacciones de forma transparente y justa para todas las partes involucradas. Una herramienta necesaria para este propósito es la Metrología, ciencia que es utilizada en el Laboratorio de Metrología (LABM) del Centro Experimenta

  10. Traditional Chinese Masks Reveal Customs

    Institute of Scientific and Technical Information of China (English)

    1996-01-01

    CHINESE masks are undoubtedly an important component in the worldwide mask culture. Minority nationality masks are a major component of China’s mask culture. Traditional Chinese masks, or nuo, represent a cultural component which originated from religious rites in prehistoric times. Various types of nuo are highly valuable for studies of Chinese customs.

  11. How the global layout of the mask influences masking strength.

    Science.gov (United States)

    Ghose, Tandra; Hermens, Frouke; Herzog, Michael H

    2012-12-10

    In visual backward masking, the perception of a target is influenced by a trailing mask. Masking is usually explained by local interactions between the target and the mask representations. However, recently it has been shown that the global spatial layout of the mask rather than its local structure determines masking strength (Hermens & Herzog, 2007). Here, we varied the mask layout by spatial, luminance, and temporal cues. We presented a vernier target followed by a mask with 25 elements. Performance deteriorated when the length of the two mask elements neighboring the target vernier was doubled. However, when the length of every second mask element was doubled, performance improved. When the luminance of the neighboring elements was doubled, performance also deteriorated but no improvement in performance was observed when every second element had a double luminance. For temporal manipulations, a complex nonmonotonic masking function was observed. Hence, changes in the mask layout by spatial, luminance, and temporal cues lead to highly different results.

  12. Mask Phenomenon in Communication

    Institute of Scientific and Technical Information of China (English)

    郎丽璇

    2013-01-01

    People sometimes wear masks. Abusive expression may be used to convey love while polite words can be exchanged among enemies. This essay describes and discusses this special phenomenon in communication and analyzes the elements that con-tribute to the success of a mask communication.

  13. Binary Masking & Speech Intelligibility

    DEFF Research Database (Denmark)

    Boldt, Jesper

    The purpose of this thesis is to examine how binary masking can be used to increase intelligibility in situations where hearing impaired listeners have difficulties understanding what is being said. The major part of the experiments carried out in this thesis can be categorized as either experime......The purpose of this thesis is to examine how binary masking can be used to increase intelligibility in situations where hearing impaired listeners have difficulties understanding what is being said. The major part of the experiments carried out in this thesis can be categorized as either...... experiments under ideal conditions or as experiments under more realistic conditions useful for real-life applications such as hearing aids. In the experiments under ideal conditions, the previously defined ideal binary mask is evaluated using hearing impaired listeners, and a novel binary mask -- the target...... binary mask -- is introduced. The target binary mask shows the same substantial increase in intelligibility as the ideal binary mask and is proposed as a new reference for binary masking. In the category of real-life applications, two new methods are proposed: a method for estimation of the ideal binary...

  14. Mask materials in powderblasting

    NARCIS (Netherlands)

    Wensink, H.; Berenschot, Johan W.; Jansen, Henricus V.; Elwenspoek, Michael Curt

    1999-01-01

    Powderblasting has the opportunity to become a standard technology in micromachining. To machine small details with powderbalsting, it is necessary to use a suiabled mask. In this paper four mask types ares examined. BF400 resist foil is most suitable for standard use in powderblasting for reason of

  15. The Moody Mask Model

    DEFF Research Database (Denmark)

    Larsen, Bjarke Alexander; Andkjær, Kasper Ingdahl; Schoenau-Fog, Henrik

    2015-01-01

    This paper proposes a new relation model, called "The Moody Mask model", for Interactive Digital Storytelling (IDS), based on Franceso Osborne's "Mask Model" from 2011. This, mixed with some elements from Chris Crawford's Personality Models, is a system designed for dynamic interaction between ch...

  16. Fractal Metrology for biogeosystems analysis

    Directory of Open Access Journals (Sweden)

    V. Torres-Argüelles

    2010-11-01

    Full Text Available The solid-pore distribution pattern plays an important role in soil functioning being related with the main physical, chemical and biological multiscale and multitemporal processes of this complex system. In the present research, we studied the aggregation process as self-organizing and operating near a critical point. The structural pattern is extracted from the digital images of three soils (Chernozem, Solonetz and "Chocolate" Clay and compared in terms of roughness of the gray-intensity distribution quantified by several measurement techniques. Special attention was paid to the uncertainty of each of them measured in terms of standard deviation. Some of the applied methods are known as classical in the fractal context (box-counting, rescaling-range and wavelets analyses, etc. while the others have been recently developed by our Group. The combination of these techniques, coming from Fractal Geometry, Metrology, Informatics, Probability Theory and Statistics is termed in this paper Fractal Metrology (FM. We show the usefulness of FM for complex systems analysis through a case study of the soil's physical and chemical degradation applying the selected toolbox to describe and compare the structural attributes of three porous media with contrasting structure but similar clay mineralogy dominated by montmorillonites.

  17. 100 Years of radionuclide metrology

    International Nuclear Information System (INIS)

    Judge, S.M.; Arnold, D.; Chauvenet, B.; Collé, R.; De Felice, P.; García-Toraño, E.; Wätjen, U.

    2014-01-01

    The discipline of radionuclide metrology at national standards institutes started in 1913 with the certification by Curie, Rutherford and Meyer of the first primary standards of radium. In early years, radium was a valuable commodity and the aim of the standards was largely to facilitate trade. The focus later changed to providing standards for the new wide range of radionuclides, so that radioactivity could be used for healthcare and industrial applications while minimising the risk to patients, workers and the environment. National measurement institutes responded to the changing demands by developing new techniques for realising primary standards of radioactivity. Looking ahead, there are likely to be demands for standards for new radionuclides used in nuclear medicine, an expansion of the scope of the field into quantitative imaging to facilitate accurate patient dosimetry for nuclear medicine, and an increasing need for accurate standards for radioactive waste management and nuclear forensics. - Highlights: • The driving forces for the development of radionuclide metrology. • Radium standards to facilitate trade of this valuable commodity in the early years. • After 1950, focus changes to healthcare and industrial applications. • National Measurement Institutes develop new techniques, standards, and disseminate the best practice in measurement. • Challenges in nuclear medicine, radioactive waste management and nuclear forensics

  18. The At-Wavelength Metrology Facility at BESSY-II

    Directory of Open Access Journals (Sweden)

    Franz Schäfers

    2016-02-01

    Full Text Available The At-Wavelength Metrology Facility at BESSY-II is dedicated to short-term characterization of novel UV, EUV and XUV optical elements, such as diffraction gratings, mirrors, multilayers and nano-optical devices like reflection zone plates. It consists of an Optics Beamline PM-1 and a Reflectometer in a clean-room hutch as a fixed end station. The bending magnet Beamline is a Plane Grating Monochromator beamline (c-PGM equipped with an SX700 monochromator. The beamline is specially tailored for efficient high-order suppression and stray light reduction. The versatile 11-axes UHV-Reflectometer can house life-sized optical elements, which are fully adjustable and of which the reflection properties can be measured in the full incidence angular range as well as in the full azimuthal angular range to determine polarization properties.

  19. Relativistic quantum metrology: exploiting relativity to improve quantum measurement technologies.

    Science.gov (United States)

    Ahmadi, Mehdi; Bruschi, David Edward; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

    2014-05-22

    We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory. Quantum field theory properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in quantum field theory including proper times and accelerations. Indeed, the techniques can be applied to develop a novel generation of relativistic quantum technologies for gravimeters, clocks and sensors. As an example, we present a high precision device which in principle improves the state-of-the-art in quantum accelerometers by exploiting relativistic effects.

  20. Phase-locking to a free-space terahertz comb for metrological-grade terahertz lasers.

    Science.gov (United States)

    Consolino, L; Taschin, A; Bartolini, P; Bartalini, S; Cancio, P; Tredicucci, A; Beere, H E; Ritchie, D A; Torre, R; Vitiello, M S; De Natale, P

    2012-01-01

    Optical frequency comb synthesizers have represented a revolutionary approach to frequency metrology, providing a grid of frequency references for any laser emitting within their spectral coverage. Extending the metrological features of optical frequency comb synthesizers to the terahertz domain would be a major breakthrough, due to the widespread range of accessible strategic applications and the availability of stable, high-power and widely tunable sources such as quantum cascade lasers. Here we demonstrate phase-locking of a 2.5 THz quantum cascade laser to a free-space comb, generated in a LiNbO(3) waveguide and covering the 0.1-6 THz frequency range. We show that even a small fraction (quantum cascade laser is sufficient to generate a beat note suitable for phase-locking to the comb, paving the way to novel metrological-grade terahertz applications, including high-resolution spectroscopy, manipulation of cold molecules, astronomy and telecommunications.

  1. A laser metrology/viewing system for ITER in-vessel inspection

    International Nuclear Information System (INIS)

    Spampinato, P.T.; Barry, R.E.; Chesser, J.B.; Herndon, J.N.; Menon, M.M.; Slotwinski, A.; Dagher, M.A.; Yuen, J.L.

    1998-01-01

    This paper identifies the requirements for the International Thermonuclear Experimental Reactor metrology and viewing system, and describes a remotely operated precision surface mapping system. A metrology system capable of achieving sub-millimeter accuracy must operate in a reactor vessel that has high gamma radiation, high vacuum, elevated temperature, and magnetic field. A coherent, frequency modulated laser radar system is under development to meet these requirements. The metrology/viewing sensor consists of a compact laser optics module linked through fiber optics to the laser source and imaging units, located outside the harsh environment. The deployment mechanism is a remotely operated telescopic-mast. Gamma irradiation to 10 7 Gy was conducted on critical sensor components at Oak Ridge National Laboratory, with no significant impact to data transmission, and analysis indicates that critical sensor components can operate in a magnetic field with certain design modifications. Plans for testing key components in a magnetic field are underway. (orig.)

  2. Two-dimensional in situ metrology of X-ray mirrors using the speckle scanning technique

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Hongchang, E-mail: hongchang.wang@diamond.ac.uk; Kashyap, Yogesh; Laundy, David; Sawhney, Kawal [Diamond Light Source Ltd, Harwell Science and Innovation Campus, Didcot OX11 0DE (United Kingdom)

    2015-06-06

    The two-dimensional slope error of an X-ray mirror has been retrieved by employing the speckle scanning technique, which will be valuable at synchrotron radiation facilities and in astronomical telescopes. In situ metrology overcomes many of the limitations of existing metrology techniques and is capable of exceeding the performance of present-day optics. A novel technique for precisely characterizing an X-ray bimorph mirror and deducing its two-dimensional (2D) slope error map is presented. This technique has also been used to perform fast optimization of a bimorph mirror using the derived 2D piezo response functions. The measured focused beam size was significantly reduced after the optimization, and the slope error map was then verified by using geometrical optics to simulate the focused beam profile. This proposed technique is expected to be valuable for in situ metrology of X-ray mirrors at synchrotron radiation facilities and in astronomical telescopes.

  3. Model-based virtual VSB mask writer verification for efficient mask error checking and optimization prior to MDP

    Science.gov (United States)

    Pack, Robert C.; Standiford, Keith; Lukanc, Todd; Ning, Guo Xiang; Verma, Piyush; Batarseh, Fadi; Chua, Gek Soon; Fujimura, Akira; Pang, Linyong

    2014-10-01

    A methodology is described wherein a calibrated model-based `Virtual' Variable Shaped Beam (VSB) mask writer process simulator is used to accurately verify complex Optical Proximity Correction (OPC) and Inverse Lithography Technology (ILT) mask designs prior to Mask Data Preparation (MDP) and mask fabrication. This type of verification addresses physical effects which occur in mask writing that may impact lithographic printing fidelity and variability. The work described here is motivated by requirements for extreme accuracy and control of variations for today's most demanding IC products. These extreme demands necessitate careful and detailed analysis of all potential sources of uncompensated error or variation and extreme control of these at each stage of the integrated OPC/ MDP/ Mask/ silicon lithography flow. The important potential sources of variation we focus on here originate on the basis of VSB mask writer physics and other errors inherent in the mask writing process. The deposited electron beam dose distribution may be examined in a manner similar to optical lithography aerial image analysis and image edge log-slope analysis. This approach enables one to catch, grade, and mitigate problems early and thus reduce the likelihood for costly long-loop iterations between OPC, MDP, and wafer fabrication flows. It moreover describes how to detect regions of a layout or mask where hotspots may occur or where the robustness to intrinsic variations may be improved by modification to the OPC, choice of mask technology, or by judicious design of VSB shots and dose assignment.

  4. What's in a mask? Information masking with forward and backward visual masks.

    Science.gov (United States)

    Davis, Chris; Kim, Jeesun

    2011-10-01

    Three experiments tested how the physical format and information content of forward and backward masks affected the extent of visual pattern masking. This involved using different types of forward and backward masks with target discrimination measured by percentage correct in the first experiment (with a fixed target duration) and by an adaptive threshold procedure in the last two. The rationale behind the manipulation of the content of the masks stemmed from masking theories emphasizing attentional and/or conceptual factors rather than visual ones. Experiment 1 used word masks and showed that masking was reduced (a masking reduction effect) when the forward and backward masks were the same word (although in different case) compared to when the masks were different words. Experiment 2 tested the extent to which a reduction in masking might occur due to the physical similarity between the forward and backward masks by comparing the effect of the same content of the masks in the same versus different case. The result showed a significant reduction in masking for same content masks but no significant effect of case. The last experiment examined whether the reduction in masking effect would be observed with nonword masks--that is, having no high-level representation. No reduction in masking was found from same compared to different nonword masks (Experiment 3). These results support the view that the conscious perception of a rapidly displayed target stimulus is in part determined by high-level perceptual/cognitive factors concerned with masking stimulus grouping and attention.

  5. Hybrid mask for deep etching

    KAUST Repository

    Ghoneim, Mohamed T.

    2017-08-10

    Deep reactive ion etching is essential for creating high aspect ratio micro-structures for microelectromechanical systems, sensors and actuators, and emerging flexible electronics. A novel hybrid dual soft/hard mask bilayer may be deposited during semiconductor manufacturing for deep reactive etches. Such a manufacturing process may include depositing a first mask material on a substrate; depositing a second mask material on the first mask material; depositing a third mask material on the second mask material; patterning the third mask material with a pattern corresponding to one or more trenches for transfer to the substrate; transferring the pattern from the third mask material to the second mask material; transferring the pattern from the second mask material to the first mask material; and/or transferring the pattern from the first mask material to the substrate.

  6. Mask Materials and Designs for Extreme Ultra Violet Lithography

    Science.gov (United States)

    Kim, Jung Sik; Ahn, Jinho

    2018-03-01

    Extreme ultra violet lithography (EUVL) is no longer a future technology but is going to be inserted into mass production of semiconductor devices of 7 nm technology node in 2018. EUVL is an extension of optical lithography using extremely short wavelength (13.5 nm). This short wavelength requires major modifications in the optical systems due to the very strong absorption of EUV light by materials. Refractive optics can no longer be used, and reflective optics is the only solution to transfer image from mask to wafer. This is why we need the multilayer (ML) mirror-based mask as well as an oblique incident angle of light. This paper discusses the principal theory on the EUV mask design and its component materials including ML reflector and EUV absorber. Mask shadowing effect (or mask 3D effect) is explained and its technical solutions like phase shift mask is reviewed. Even though not all the technical issues on EUV mask are handled in this review paper, you will be able to understand the principles determining the performance of EUV masks.

  7. 2012 Mask Industry Survey

    Science.gov (United States)

    Malloy, Matt; Litt, Lloyd C.

    2012-11-01

    A survey supported by SEMATECH and administered by David Powell Consulting was sent to semiconductor industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. 2012 marks the 11th consecutive year for the mask industry survey. This year's survey and reporting structure are similar to those of the previous years with minor modifications based on feedback from past years and the need to collect additional data on key topics. Categories include general mask information, mask processing, data and write time, yield and yield loss, delivery times, and maintenance and returns. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. Results, initial observations, and key comparisons between the 2011 and 2012 survey responses are shown here, including multiple indications of a shift towards the manufacturing of higher end photomasks.

  8. Mask quality assessment

    Science.gov (United States)

    Regis, Larry; Paulson, Neil; Reynolds, James A.

    1994-02-01

    Product quality and timely delivery are two of the most important parameters, determining the success of a mask manufacturing facility. Because of the sensitivity of this data, however, very little is known about industry performance in these areas. Using Arthur Andersen & Co. to protect contributor identity, the authors have conducted a blind quality survey of mask shops which represents over 75% of the total merchant and captive mask volume in the US. Quantities such as return rate, plate survival yield, performance to schedule and reason for return were requested from 1988 through Q2 1993. Data is analyzed and conclusions are presented.

  9. Manufacturing and metrology for IR conformal windows and domes

    Science.gov (United States)

    Ferralli, Ian; Blalock, Todd; Brunelle, Matt; Lynch, Timothy; Myer, Brian; Medicus, Kate

    2017-05-01

    Freeform and conformal optics have the potential to dramatically improve optical systems by enabling systems with fewer optical components, reduced aberrations, and improved aerodynamic performance. These optical components differ from standard components in their surface shape, typically a non-symmetric equation based definition, and material properties. Traditional grinding and polishing tools are unable to handle these freeform shapes. Additionally, standard metrology tools cannot measure these surfaces. Desired substrates are typically hard ceramics, including poly-crystalline alumina or aluminum oxynitride. Notwithstanding the challenges that the hardness provides to manufacturing, these crystalline materials can be highly susceptible to grain decoration creating unacceptable scatter in optical systems. In this presentation, we will show progress towards addressing the unique challenges of manufacturing conformal windows and domes. Particular attention is given to our robotic polishing platform. This platform is based on an industrial robot adapted to accept a wide range of tooling and parts. The robot's flexibility has provided us an opportunity to address the unique challenges of conformal windows. Slurries and polishing active layers can easily be changed to adapt to varying materials and address grain decoration. We have the flexibility to change tool size and shape to address the varying sizes and shapes of conformal optics. In addition, the robotic platform can be a base for a deflectometry-based metrology tool to measure surface form error. This system, whose precision is independent of the robot's positioning accuracy, will allow us to measure optics in-situ saving time and reducing part risk. In conclusion, we will show examples of the conformal windows manufactured using our developed processes.

  10. Bayesian estimation methods in metrology

    International Nuclear Information System (INIS)

    Cox, M.G.; Forbes, A.B.; Harris, P.M.

    2004-01-01

    In metrology -- the science of measurement -- a measurement result must be accompanied by a statement of its associated uncertainty. The degree of validity of a measurement result is determined by the validity of the uncertainty statement. In recognition of the importance of uncertainty evaluation, the International Standardization Organization in 1995 published the Guide to the Expression of Uncertainty in Measurement and the Guide has been widely adopted. The validity of uncertainty statements is tested in interlaboratory comparisons in which an artefact is measured by a number of laboratories and their measurement results compared. Since the introduction of the Mutual Recognition Arrangement, key comparisons are being undertaken to determine the degree of equivalence of laboratories for particular measurement tasks. In this paper, we discuss the possible development of the Guide to reflect Bayesian approaches and the evaluation of key comparison data using Bayesian estimation methods

  11. Neutron metrology in the HFR

    International Nuclear Information System (INIS)

    Polle, A.N.; Voorbraak, W.P.

    1991-11-01

    The experiment R-139-416 for testing the stainless steel type 316L(N) has been irradiated in the HFR Petten. This report presents the final metrology results obtained from activation monitors near the CT-specimen (Compact Tension). Data about the helium production as well as the number of displacements per atom are also included. The irradiation conditions for this experiment, carried out in a REFA-170 type capsule in the HFR position H8, are as close as possible to the conditions of the EFR (European Fast Reactor) above-core structures. The main results of the thermal and fast neutron fluence measurements are presented in table 1 and in figure 1. (author). 10 refs.; 2 figs.; 11 tabs

  12. Metrological aspects of enzyme production

    International Nuclear Information System (INIS)

    Kerber, T M; Pereira-Meirelles, F V; Dellamora-Ortiz, G M

    2010-01-01

    Enzymes are frequently used in biotechnology to carry out specific biological reactions, either in industrial processes or for the production of bioproducts and drugs. Microbial lipases are an important group of biotechnologically valuable enzymes that present widely diversified applications. Lipase production by microorganisms is described in several published papers; however, none of them refer to metrological evaluation and the estimation of the uncertainty in measurement. Moreover, few of them refer to process optimization through experimental design. The objectives of this work were to enhance lipase production in shaken-flasks with Yarrowia lipolytica cells employing experimental design and to evaluate the uncertainty in measurement of lipase activity. The highest lipolytic activity obtained was about three- and fivefold higher than the reported activities of CRMs BCR-693 and BCR-694, respectively. Lipase production by Y. lipolytica cells aiming the classification as certified reference material is recommended after further purification and stability studies

  13. A universal quantum module for quantum communication, computation, and metrology

    Science.gov (United States)

    Hanks, Michael; Lo Piparo, Nicolò; Trupke, Michael; Schmiedmayer, Jorg; Munro, William J.; Nemoto, Kae

    2017-08-01

    In this work, we describe a simple module that could be ubiquitous for quantum information based applications. The basic modules comprises a single NV- center in diamond embedded in an optical cavity, where the cavity mediates interactions between photons and the electron spin (enabling entanglement distribution and efficient readout), while the nuclear spins constitutes a long-lived quantum memories capable of storing and processing quantum information. We discuss how a network of connected modules can be used for distributed metrology, communication and computation applications. Finally, we investigate the possible use of alternative diamond centers (SiV/GeV) within the module and illustrate potential advantages.

  14. National Needs for Appearance Metrology

    Science.gov (United States)

    Nadal, Maria E.

    2003-04-01

    Appearance greatly influences a customer's judgement of the quality and acceptability of manufactured products, as yearly there is approximately $700 billion worth of shipped goods for which overall appearance is critical to their sale. For example, appearance is reported to be a major factor in about half of automobile purchases. The appearance of an object is the result of a complex interaction of the light field incident upon the object, the scattering and absorption properties of the object, and human perception. The measurable attributes of appearance are divided into color (hue, saturation, and lightness) and geometry (gloss, haze). The nature of the global economy has increased international competition and the need to improve the quality of many manufactured products. Since the manufacturing and marketing of these products is international in scope, the lack of national appearance standard artifacts and measurement protocols results in a direct loss to the supplier. One of the primary missions of the National Institute of Standards and Technology (NIST) is to strengthen the U.S. economy by working with industry to develop and apply technology, measurements and standards. The NIST Physics Laboratory has established an appearance metrology laboratory. This new laboratory provides calibration services for 0^o/45^o color standards and 20^o°, 60^o°, and 85^o° specular gloss, and research in the colorimetric characterization of gonioapparent including a new Standard Reference Material for metallic coatings (SRM 2017) and measurement protocols for pearlescent coatings. These services are NIST's first appearance metrology efforts in many years; a response to needs articulated by industry. These services are designed to meet demands for improved measurements and standards to enhance the acceptability of final products since appearance often plays a major role in their acceptability.

  15. Metrology in Pharmaceutical Industry - A Case Study

    International Nuclear Information System (INIS)

    Yuvamoto, Priscila D.; Fermam, Ricardo K. S.; Nascimento, Elizabeth S.

    2016-01-01

    Metrology is recognized by improving production process, increasing the productivity, giving more reliability to the measurements and consequently, it impacts in the economy of a country. Pharmaceutical area developed GMP (Good Manufacture Practice) requeriments, with no introduction of metrological concepts. However, due to Nanomedicines, it is expected this approach and the consequent positive results. The aim of this work is to verify the level of metrology implementation in a Brazilian pharmaceutical industry, using a case study. The purpose is a better mutual comprehension by both areas, acting together and governmental support to robustness of Brazilian pharmaceutical area. (paper)

  16. Reconstruction of freeform surfaces for metrology

    International Nuclear Information System (INIS)

    El-Hayek, N; Nouira, H; Anwer, N; Damak, M; Gibaru, O

    2014-01-01

    The application of freeform surfaces has increased since their complex shapes closely express a product's functional specifications and their machining is obtained with higher accuracy. In particular, optical surfaces exhibit enhanced performance especially when they take aspheric forms or more complex forms with multi-undulations. This study is mainly focused on the reconstruction of complex shapes such as freeform optical surfaces, and on the characterization of their form. The computer graphics community has proposed various algorithms for constructing a mesh based on the cloud of sample points. The mesh is a piecewise linear approximation of the surface and an interpolation of the point set. The mesh can further be processed for fitting parametric surfaces (Polyworks ® or Geomagic ® ). The metrology community investigates direct fitting approaches. If the surface mathematical model is given, fitting is a straight forward task. Nonetheless, if the surface model is unknown, fitting is only possible through the association of polynomial Spline parametric surfaces. In this paper, a comparative study carried out on methods proposed by the computer graphics community will be presented to elucidate the advantages of these approaches. We stress the importance of the pre-processing phase as well as the significance of initial conditions. We further emphasize the importance of the meshing phase by stating that a proper mesh has two major advantages. First, it organizes the initially unstructured point set and it provides an insight of orientation, neighbourhood and curvature, and infers information on both its geometry and topology. Second, it conveys a better segmentation of the space, leading to a correct patching and association of parametric surfaces

  17. Masked Photocathode for Photoinjector

    International Nuclear Information System (INIS)

    Qiang, Ji

    2010-01-01

    In this research note, we propose a scheme to insert a photocathode inside a photoinjector for generating high brightness electron beam. Instead of mounting the photocathode onto the electrode, a masked electrode with small hole is used to shield the photocathode from the accelerating vacuum chamber. Using such a masked photocathode will make the replacement of photocathode material very simple by rotating the photocathode behind the mask into the hole. This will significantly increase the usage lifetime of a photocathode. Furthermore, this also helps reduce the dark current or secondary electron emission from the photocathode. The hole on the mask also provides a transverse cut-off to the Gaussian laser profile which can be beneficial from the beam dynamics point of view.

  18. Optical modeling of Fresnel zoneplate microscopes

    International Nuclear Information System (INIS)

    Naulleau, Patrick P.; Mochi, Iacopo; Goldberg, Kenneth A.

    2011-01-01

    Defect free masks remain one of the most significant challenges facing the commercialization of extreme ultraviolet (EUV) lithography. Progress on this front requires high-performance wavelength-specific metrology of EUV masks, including high-resolution and aerial-image microscopy performed near the 13.5 nm wavelength. Arguably the most cost-effective and rapid path to proliferating this capability is through the development of Fresnel zoneplate-based microscopes. Given the relative obscurity of such systems, however, modeling tools are not necessarily optimized to deal with them and their imaging properties are poorly understood. Here we present a modeling methodology to analyze zoneplate microscopes based on commercially available optical modeling software and use the technique to investigate the imaging performance of an off-axis EUV microscope design. The modeling predicts that superior performance can be achieved by tilting the zoneplate, making it perpendicular to the chief ray at the center of the field, while designing the zoneplate to explicitly work in that tilted plane. Although the examples presented here are in the realm of EUV mask inspection, the methods described and analysis results are broadly applicable to zoneplate microscopes in general, including full-field soft-x-ray microscopes routinely used in the synchrotron community.

  19. Robust source and mask optimization compensating for mask topography effects in computational lithography.

    Science.gov (United States)

    Li, Jia; Lam, Edmund Y

    2014-04-21

    Mask topography effects need to be taken into consideration for a more accurate solution of source mask optimization (SMO) in advanced optical lithography. However, rigorous 3D mask models generally involve intensive computation and conventional SMO fails to manipulate the mask-induced undesired phase errors that degrade the usable depth of focus (uDOF) and process yield. In this work, an optimization approach incorporating pupil wavefront aberrations into SMO procedure is developed as an alternative to maximize the uDOF. We first design the pupil wavefront function by adding primary and secondary spherical aberrations through the coefficients of the Zernike polynomials, and then apply the conjugate gradient method to achieve an optimal source-mask pair under the condition of aberrated pupil. We also use a statistical model to determine the Zernike coefficients for the phase control and adjustment. Rigorous simulations of thick masks show that this approach provides compensation for mask topography effects by improving the pattern fidelity and increasing uDOF.

  20. Gilded Silver Mask

    Institute of Scientific and Technical Information of China (English)

    1998-01-01

    This gilded silver mask from the Liao Dynasty is 31 cm long and 22.2 cm wide. The plump oval face was designed with a protruding brow ridge, narrow eyes, high-bridged nose and closed mouth. The chin is slightly round against a thin neck, the ears are long and the hair can be clearly seen from the finely carved lines. The use of masks was recorded as

  1. Efficient three-dimensional resist profile-driven source mask optimization optical proximity correction based on Abbe-principal component analysis and Sylvester equation

    Science.gov (United States)

    Lin, Pei-Chun; Yu, Chun-Chang; Chen, Charlie Chung-Ping

    2015-01-01

    As one of the critical stages of a very large scale integration fabrication process, postexposure bake (PEB) plays a crucial role in determining the final three-dimensional (3-D) profiles and lessening the standing wave effects. However, the full 3-D chemically amplified resist simulation is not widely adopted during the postlayout optimization due to the long run-time and huge memory usage. An efficient simulation method is proposed to simulate the PEB while considering standing wave effects and resolution enhancement techniques, such as source mask optimization and subresolution assist features based on the Sylvester equation and Abbe-principal component analysis method. Simulation results show that our algorithm is 20× faster than the conventional Gaussian convolution method.

  2. The quality of measurements a metrological reference

    CERN Document Server

    Fridman, A E

    2012-01-01

    This book provides a detailed discussion and commentary on the fundamentals of metrology. The fundamentals of metrology, the principles underlying the design of the SI International System of units, the theory of measurement error, a new methodology for estimation of measurement accuracy based on uncertainty, and methods for reduction of measured results and estimation of measurement uncertainty are all discussed from a modern point of view. The concept of uncertainty is shown to be consistent with the classical theory of accuracy. The theory of random measurement errors is supplemented by a very general description based on the generalized normal distribution; systematic instrumental error is described in terms of a methodology for normalizing the metrological characteristics of measuring instruments. A new international system for assuring uniformity of measurements based on agreements between national metrological institutes is discussed, in addition to the role and procedure for performance of key compari...

  3. UPWIND 1A2 Metrology. Final Report

    DEFF Research Database (Denmark)

    Eecen, P.J.; Wagenaar, J.W.; Stefanatos, N.

    . Since this problem covers many areas of wind energy, the work package is defined as a crosscutting activity. The objectives of the metrology work package are to develop metrology tools in wind energy to significantly enhance the quality of measurement and testing techniques. The first deliverable...... is a valuable tool for the further assessment and interest has been shown from other work packages, such as Training. This report describes the activities that have been carried out in the Work Package 1A2 Metrology of the UpWind project. Activities from Risø are described in a separate report: T.F. Pedersen...... was to perform a state of the art assessment to identify all relevant measurands. The required accuracies and required sampling frequencies have been identified from the perspective of the users of the data (the other work packages in UpWind). This work led to the definition of the Metrology Database, which...

  4. In-die photomask registration and overlay metrology with PROVE using 2D correlation methods

    Science.gov (United States)

    Seidel, D.; Arnz, M.; Beyer, D.

    2011-11-01

    According to the ITRS roadmap, semiconductor industry drives the 193nm lithography to its limits, using techniques like double exposure, double patterning, mask-source optimization and inverse lithography. For photomask metrology this translates to full in-die measurement capability for registration and critical dimension together with challenging specifications for repeatability and accuracy. Especially, overlay becomes more and more critical and must be ensured on every die. For this, Carl Zeiss SMS has developed the next generation photomask registration and overlay metrology tool PROVE® which serves the 32nm node and below and which is already well established in the market. PROVE® features highly stable hardware components for the stage and environmental control. To ensure in-die measurement capability, sophisticated image analysis methods based on 2D correlations have been developed. In this paper we demonstrate the in-die capability of PROVE® and present corresponding measurement results for shortterm and long-term measurements as well as the attainable accuracy for feature sizes down to 85nm using different illumination modes and mask types. Standard measurement methods based on threshold criteria are compared with the new 2D correlation methods to demonstrate the performance gain of the latter. In addition, mask-to-mask overlay results of typical box-in-frame structures down to 200nm feature size are presented. It is shown, that from overlay measurements a reproducibility budget can be derived that takes into account stage, image analysis and global effects like mask loading and environmental control. The parts of the budget are quantified from measurement results to identify critical error contributions and to focus on the corresponding improvement strategies.

  5. Masks: The Artist in Me

    Science.gov (United States)

    Skophammer, Karen

    2009-01-01

    Whether masks are made from cardboard, papier-mache, metal, wood, leather, fabric, clay or any combination of these materials, they bring out the artist in people. Young children like to wear masks when they play to pretend they were another person or animal. Masks let them fantasize and be creative. The author's students made masks representing…

  6. Preface: The 5th International Workshop on X-ray Mirror Design, Fabrication, and Metrology

    Energy Technology Data Exchange (ETDEWEB)

    Assoufid, Lahsen [Argonne National Laboratory, 9700 South Cass Avenue, Lemont, Illinois 60439 (United States); Goldberg, Kenneth; Yashchuk, Valeriy V. [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States)

    2016-05-15

    Recent developments in synchrotron storage rings and free-electron laser-based x-ray sources with ever-increasing brightness and coherent flux have pushed x-ray optics requirements to new frontiers. This Special Topic gathers a set of articles derived from a subset of the key presentations of the International Workshop on X-ray Mirrors Fabrication (IWXM-2015) and Metrology held at Lawrence Berkley National Laboratory, Berkeley, California, USA, July 14–16, 2015. The workshop objective was to report on recent progress in x-ray synchrotron radiation mirrors fabrication as well as on new developments in related metrology tools and methods.

  7. Impact of the ITRS Metrology Roadmap

    International Nuclear Information System (INIS)

    Diebold, Alain C.

    2001-01-01

    The International Technology Roadmap for Semiconductors (ITRS) provides the semiconductor industry with the timing of critical technology needs for future generations of integrated circuits. The Metrology roadmap in the ITRS describes the measurement needs based on the process requirements found in the Lithography, Front End Processes, Interconnect, and Packaging Roadmaps. This paper illustrates the impact of the Metrology Roadmap on the development of key measurement technology

  8. Slovak Institute of Metrology. Annual Report 2001

    International Nuclear Information System (INIS)

    Bily, M.

    2002-03-01

    A brief account of activities carried out by the Slovak Institute of Metrology (SMU) in 2001 is presented. These activities are reported under the headings: (1) Organisation identification; (2) Mission and medium-term perspectives; (3) Contract with Slovak Office of Standards, Metrology and Testing of the Slovak Republic; (4) SMU activities ; (5) Economic results; (6) Personnel management; (7) Aims and results of their fulfilment; (8) Evaluation and analysis of SMU development in 2001; (9) Main group of outputs users; (10) Conclusion

  9. Objectives and functions of ionizing radiation metrology

    International Nuclear Information System (INIS)

    Rothe, H.

    1981-01-01

    Proceeding from the fundamental objectives of ionizing radiation metrology, the main tasks of metrological research and assurances of accurate measurements in dosimetry and activity determination are summarized. With a view to the technical performance of these tasks the state-of-the-art and the trends in reproduction and dissemination of dosimetric and activity units are outlined. Problems are derived that should be solved within the framework of the CMEA Standing Commissions on Standardization and on the Peaceful Uses of Atomic Energy. (author)

  10. Remote laboratory for phase-aided 3D microscopic imaging and metrology

    Science.gov (United States)

    Wang, Meng; Yin, Yongkai; Liu, Zeyi; He, Wenqi; Li, Boqun; Peng, Xiang

    2014-05-01

    In this paper, the establishment of a remote laboratory for phase-aided 3D microscopic imaging and metrology is presented. Proposed remote laboratory consists of three major components, including the network-based infrastructure for remote control and data management, the identity verification scheme for user authentication and management, and the local experimental system for phase-aided 3D microscopic imaging and metrology. The virtual network computer (VNC) is introduced to remotely control the 3D microscopic imaging system. Data storage and management are handled through the open source project eSciDoc. Considering the security of remote laboratory, the fingerprint is used for authentication with an optical joint transform correlation (JTC) system. The phase-aided fringe projection 3D microscope (FP-3DM), which can be remotely controlled, is employed to achieve the 3D imaging and metrology of micro objects.

  11. DABAM: an open-source database of X-ray mirrors metrology

    Energy Technology Data Exchange (ETDEWEB)

    Sanchez del Rio, Manuel, E-mail: srio@esrf.eu [ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble (France); Bianchi, Davide [AC2T Research GmbH, Viktro-Kaplan-Strasse 2-C, 2700 Wiener Neustadt (Austria); Cocco, Daniele [SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, CA 94025 (United States); Glass, Mark [ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble (France); Idir, Mourad [NSLS II, Brookhaven National Laboratory, Upton, NY 11973-5000 (United States); Metz, Jim [InSync Inc., 2511C Broadbent Parkway, Albuquerque, NM 87107 (United States); Raimondi, Lorenzo; Rebuffi, Luca [Elettra-Sincrotrone Trieste SCpA, Basovizza (TS) (Italy); Reininger, Ruben; Shi, Xianbo [Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439 (United States); Siewert, Frank [BESSY II, Helmholtz Zentrum Berlin, Institute for Nanometre Optics and Technology, Albert-Einstein-Strasse 15, 12489 Berlin (Germany); Spielmann-Jaeggi, Sibylle [Swiss Light Source at Paul Scherrer Institut, CH-5232 Villigen PSI (Switzerland); Takacs, Peter [Instrumentation Division, Brookhaven National Laboratory, Upton, NY 11973-5000 (United States); Tomasset, Muriel [Synchrotron Soleil (France); Tonnessen, Tom [InSync Inc., 2511C Broadbent Parkway, Albuquerque, NM 87107 (United States); Vivo, Amparo [ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble (France); Yashchuk, Valeriy [Advanced Light Source, Lawrence Berkeley National Laboratory, MS 15-R0317, 1 Cyclotron Road, Berkeley, CA 94720-8199 (United States)

    2016-04-20

    DABAM, an open-source database of X-ray mirrors metrology to be used with ray-tracing and wave-propagation codes for simulating the effect of the surface errors on the performance of a synchrotron radiation beamline. An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper, with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.

  12. Speckle-based at-wavelength metrology of X-ray mirrors with super accuracy.

    Science.gov (United States)

    Kashyap, Yogesh; Wang, Hongchang; Sawhney, Kawal

    2016-05-01

    X-ray active mirrors, such as bimorph and mechanically bendable mirrors, are increasingly being used on beamlines at modern synchrotron source facilities to generate either focused or "tophat" beams. As well as optical tests in the metrology lab, it is becoming increasingly important to optimise and characterise active optics under actual beamline operating conditions. Recently developed X-ray speckle-based at-wavelength metrology technique has shown great potential. The technique has been established and further developed at the Diamond Light Source and is increasingly being used to optimise active mirrors. Details of the X-ray speckle-based at-wavelength metrology technique and an example of its applicability in characterising and optimising a micro-focusing bimorph X-ray mirror are presented. Importantly, an unprecedented angular sensitivity in the range of two nanoradians for measuring the slope error of an optical surface has been demonstrated. Such a super precision metrology technique will be beneficial to the manufacturers of polished mirrors and also in optimization of beam shaping during experiments.

  13. Speckle-based at-wavelength metrology of X-ray mirrors with super accuracy

    Energy Technology Data Exchange (ETDEWEB)

    Kashyap, Yogesh; Wang, Hongchang; Sawhney, Kawal, E-mail: kawal.sawhney@diamond.ac.uk [Diamond Light Source, Harwell Science and Innovation Campus, Didcot OX11 0DE (United Kingdom)

    2016-05-15

    X-ray active mirrors, such as bimorph and mechanically bendable mirrors, are increasingly being used on beamlines at modern synchrotron source facilities to generate either focused or “tophat” beams. As well as optical tests in the metrology lab, it is becoming increasingly important to optimise and characterise active optics under actual beamline operating conditions. Recently developed X-ray speckle-based at-wavelength metrology technique has shown great potential. The technique has been established and further developed at the Diamond Light Source and is increasingly being used to optimise active mirrors. Details of the X-ray speckle-based at-wavelength metrology technique and an example of its applicability in characterising and optimising a micro-focusing bimorph X-ray mirror are presented. Importantly, an unprecedented angular sensitivity in the range of two nanoradians for measuring the slope error of an optical surface has been demonstrated. Such a super precision metrology technique will be beneficial to the manufacturers of polished mirrors and also in optimization of beam shaping during experiments.

  14. Speckle-based at-wavelength metrology of X-ray mirrors with super accuracy

    International Nuclear Information System (INIS)

    Kashyap, Yogesh; Wang, Hongchang; Sawhney, Kawal

    2016-01-01

    X-ray active mirrors, such as bimorph and mechanically bendable mirrors, are increasingly being used on beamlines at modern synchrotron source facilities to generate either focused or “tophat” beams. As well as optical tests in the metrology lab, it is becoming increasingly important to optimise and characterise active optics under actual beamline operating conditions. Recently developed X-ray speckle-based at-wavelength metrology technique has shown great potential. The technique has been established and further developed at the Diamond Light Source and is increasingly being used to optimise active mirrors. Details of the X-ray speckle-based at-wavelength metrology technique and an example of its applicability in characterising and optimising a micro-focusing bimorph X-ray mirror are presented. Importantly, an unprecedented angular sensitivity in the range of two nanoradians for measuring the slope error of an optical surface has been demonstrated. Such a super precision metrology technique will be beneficial to the manufacturers of polished mirrors and also in optimization of beam shaping during experiments.

  15. True-color 3D surface metrology for additive manufacturing using interference microscopy

    OpenAIRE

    DiSciacca, Jack; Gomez, Carlos; Thompson, Adam; Lawes, Simon; Leach, Richard; Colonna de Lega, Xavier; de Groot, Peter

    2017-01-01

    Coherence scanning interferometry (CSI) is widely used for surface topography characterisation. With the ability to measure both rough surfaces with the high slopes and optical finishes, CSI has made contibutions in fields from industrial machining to optical fabrication and polishing [1,2]. While the low coherence sources for CSI are typically broadband and suitable for color imaging, the metrology is usually performed without regards for the color information [3]. We present color surface t...

  16. Orion Emergency Mask Approach

    Science.gov (United States)

    Tuan, George C.; Graf, John C.

    2009-01-01

    Emergency mask approach on Orion poses a challenge to the traditional Shuttle or Station approaches. Currently, in the case of a fire or toxic spill event, the crew utilizes open loop oxygen masks that provide the crew with oxygen to breath, but also dumps the exhaled oxygen into the cabin. For Orion, with a small cabin volume, the extra oxygen will exceed the flammability limit within a short period of time, unless a nitrogen purge is also provided. Another approach to a fire or toxic spill event is the use of a filtering emergency masks. These masks utilize some form of chemical beds to scrub the air clean of toxic providing the crew safe breathing air for a period without elevating the oxygen level in the cabin. Using the masks and a form of smoke-eater filter, it may be possible to clean the cabin completely or to a level for safe transition to a space suit to perform a cabin purge. Issues with filters in the past have been the reaction time, breakthroughs, and high breathing resistance. Development in a new form of chemical filters has shown promise to make the filtering approach feasible.

  17. EUV mask process specifics and development challenges

    Science.gov (United States)

    Nesladek, Pavel

    2014-07-01

    EUV lithography is currently the favorite and most promising candidate among the next generation lithography (NGL) technologies. Decade ago the NGL was supposed to be used for 45 nm technology node. Due to introduction of immersion 193nm lithography, double/triple patterning and further techniques, the 193 nm lithography capabilities was greatly improved, so it is expected to be used successfully depending on business decision of the end user down to 10 nm logic. Subsequent technology node will require EUV or DSA alternative technology. Manufacturing and especially process development for EUV technology requires significant number of unique processes, in several cases performed at dedicated tools. Currently several of these tools as e.g. EUV AIMS or actinic reflectometer are not available on site yet. The process development is done using external services /tools with impact on the single unit process development timeline and the uncertainty of the process performance estimation, therefore compromises in process development, caused by assumption about similarities between optical and EUV mask made in experiment planning and omitting of tests are further reasons for challenges to unit process development. Increased defect risk and uncertainty in process qualification are just two examples, which can impact mask quality / process development. The aim of this paper is to identify critical aspects of the EUV mask manufacturing with respect to defects on the mask with focus on mask cleaning and defect repair and discuss the impact of the EUV specific requirements on the experiments needed.

  18. Ni-Al Alloys as Alternative EUV Mask Absorber

    Directory of Open Access Journals (Sweden)

    Vu Luong

    2018-03-01

    Full Text Available Extreme ultraviolet (EUV lithography is being industrialized as the next candidate printing technique for high-volume manufacturing of scaled down integrated circuits. At mask level, the combination of EUV light at oblique incidence, absorber thickness, and non-uniform mirror reflectance through incidence angle, creates photomask-induced imaging aberrations, known as mask 3D (M3D effects. A possible mitigation for the M3D effects in the EUV binary intensity mask (BIM, is to use mask absorber materials with high extinction coefficient κ and refractive coefficient n close to unity. We propose nickel aluminide alloys as a candidate BIM absorber material, and characterize them versus a set of specifications that a novel EUV mask absorber must meet. The nickel aluminide samples have reduced crystallinity as compared to metallic nickel, and form a passivating surface oxide layer in neutral solutions. Composition and density profile are investigated to estimate the optical constants, which are then validated with EUV reflectometry. An oxidation-induced Al L2 absorption edge shift is observed, which significantly impacts the value of n at 13.5 nm wavelength and moves it closer to unity. The measured optical constants are incorporated in an accurate mask model for rigorous simulations. The M3D imaging impact of the nickel aluminide alloy mask absorbers, which predict significant M3D reduction in comparison to reference absorber materials. In this paper, we present an extensive experimental methodology flow to evaluate candidate mask absorber materials.

  19. Individuals and Their Masks

    Directory of Open Access Journals (Sweden)

    Belén Altuna

    2009-08-01

    Full Text Available This essay works on the opposition between face and mask, where ‘face’ is understood as that which makes every human being singular, and makes visible her or his unique worth, while ‘mask’ is understood as whatever hides that singularity, and refers to a category, stereotype or cliché. The etymological history that relates face and mask to the concept of person, and the history of modern portrait painting, which alternates representations of face and mask, both lead to a discussion with authors who diagnose a contemporary “defeat of the face” as a result of the crisis of humanism and of ethical individualism, which give meaning and dignity to that face.

  20. A decade of innovation with laser speckle metrology

    Science.gov (United States)

    Ettemeyer, Andreas

    2003-05-01

    Speckle Pattern Interferometry has emerged from the experimental substitution of holographic interferometry to become a powerful problem solving tool in research and industry. The rapid development of computer and digital imaging techniques in combination with minaturization of the optical equipment led to new applications which had not been anticipated before. While classical holographic interferometry had always required careful consideration of the environmental conditions such as vibration, noise, light, etc. and could generally only be performed in the optical laboratory, it is now state of the art, to handle portable speckle measuring equipment at almost any place. During the last decade, the change in design and technique has dramatically influenced the range of applications of speckle metrology and opened new markets. The integration of recent research results into speckle measuring equipment has led to handy equipment, simplified the operation and created high quality data output.

  1. Spectroscopic metrology for isotope composition measurements and transfer standards

    Science.gov (United States)

    Anyangwe Nwaboh, Javis; Balslev-Harder, David; Kääriäinen, Teemu; Richmond, Craig; Manninen, Albert; Mohn, Joachim; Kiseleva, Maria; Petersen, Jan C.; Werhahn, Olav; Ebert, Volker

    2017-04-01

    The World Meteorological Organization (WMO) has identified greenhouse gases such as CO2, CH4 and N2O as critical for global climate monitoring. Other molecules such as CO that has an indirect effect of enhancing global warming are also monitored. WMO has stated compatibility goals for atmospheric concentration and isotope ratio measurements of these gases, e.g. 0.1 ppm for CO2 concentration measurements in the northern hemisphere and 0.01 ‰ for δ13C-CO2. For measurements of the concentration of greenhouse gases, gas analysers are typically calibrated with static gas standards e.g. traceable to the WMO scale or to the International System of Units (SI) through a national metrology institute. However, concentrations of target components, e.g. CO, in static gas standards have been observed to drift, and typically the gas matrix as well as the isotopic composition of the target component does not always reflect field gas composition, leading to deviations of the analyser response, even after calibration. The deviations are dependent on the measurement technique. To address this issue, part of the HIGHGAS (Metrology for high-impact greenhouse gases) project [1] focused on the development of optical transfer standards (OTSs) for greenhouse gases, e.g. CO2 and CO, potentially complementing gas standards. Isotope ratio mass spectrometry (IRMS) [2] is currently used to provide state-of-the-art high precision (in the 0.01 ‰ range) measurements for the isotopic composition of greenhouse gases. However, there is a need for field-deployable techniques such as optical isotope ratio spectroscopy (OIRS) that can be combined with metrological measurement methods. Within the HIGHGAS project, OIRS methods and procedures based on e.g. cavity enhanced spectroscopy (CES) and tunable diode laser absorption spectroscopy (TDLAS), matched to metrological principles have been established for the measurement of 13C/12C and 18O/16O ratios in CO2, 15N/14N ratios in N2O, and 13C/12C and 2H

  2. Competing for Consciousness: Prolonged Mask Exposure Reduces Object Substitution Masking

    Science.gov (United States)

    Goodhew, Stephanie C.; Visser, Troy A. W.; Lipp, Ottmar V.; Dux, Paul E.

    2011-01-01

    In object substitution masking (OSM) a sparse, temporally trailing 4-dot mask impairs target identification, even though it has different contours from, and does not spatially overlap with the target. Here, we demonstrate a previously unknown characteristic of OSM: Observers show reduced masking at prolonged (e.g., 640 ms) relative to intermediate…

  3. Distributed large-scale dimensional metrology new insights

    CERN Document Server

    Franceschini, Fiorenzo; Maisano, Domenico

    2011-01-01

    Focuses on the latest insights into and challenges of distributed large scale dimensional metrology Enables practitioners to study distributed large scale dimensional metrology independently Includes specific examples of the development of new system prototypes

  4. Metrology and properties of engineering surfaces

    CERN Document Server

    Greenwood, J; Chetwynd, D

    2001-01-01

    Metrology and Properties of Engineering Surfaces provides in a single volume a comprehensive and authoritative treatment of the crucial topics involved in the metrology and properties of engineering surfaces. The subject matter is a central issue in manufacturing technology, since the quality and reliability of manufactured components depend greatly upon the selection and qualities of the appropriate materials as ascertained through measurement. The book can in broad terms be split into two parts; the first deals with the metrology of engineering surfaces and covers the important issues relating to the measurement and characterization of surfaces in both two and three dimensions. This covers topics such as filtering, power spectral densities, autocorrelation functions and the use of Fractals in topography. A significant proportion is dedicated to the calibration of scanning probe microscopes using the latest techniques. The remainder of the book deals with the properties of engineering surfaces and covers a w...

  5. Metrological AFMs and its application for versatile nano-dimensional metrology tasks

    Science.gov (United States)

    Dai, Gaoliang; Dziomba, T.; Pohlenz, F.; Danzebrink, H.-U.; Koenders, L.

    2010-08-01

    Traceable calibrations of various micro and nano measurement devices are crucial tasks for ensuring reliable measurements for micro and nanotechnology. Today metrological AFM are widely used for traceable calibrations of nano dimensional standards. In this paper, we introduced the developments of metrological force microscopes at PTB. Of the three metrological AFMs described here, one is capable of measuring in a volume of 25 mm x 25 mm x 5 mm. All instruments feature interferometers and the three-dimensional position measurements are thus directly traceable to the metre definition. Some calibration examples on, for instance, flatness standards, step height standards, one and two dimensional gratings are demonstrated.

  6. Interoperability: linking design and tolerancing with metrology.

    Science.gov (United States)

    Morse, Edward; Heysiattalab, Saeed; Barnard-Feeney, Allison; Hedberg, Thomas

    2016-01-01

    On October 30, 2014 the American National Standards Institute (ANSI) approved QIF v 2.0 (Quality Information Framework, version 2.0) as an American National Standard. Subsequently in early 2016 QIF version 2.1 was approved. This paper describes how the QIF standard models the information necessary for quality workflow across the full metrology enterprise. After a brief description of the XML 'language' used in the standard, the paper reports on how the standard enables information exchange among four major activities in the metrology enterprise (product definition; measurement planning; measurement execution; and the analysis and reporting of the quality data).

  7. Industrial Photogrammetry - Accepted Metrology Tool or Exotic Niche

    Science.gov (United States)

    Bösemann, Werner

    2016-06-01

    New production technologies like 3D printing and other adaptive manufacturing technologies have changed the industrial manufacturing process, often referred to as next industrial revolution or short industry 4.0. Such Cyber Physical Production Systems combine virtual and real world through digitization, model building process simulation and optimization. It is commonly understood that measurement technologies are the key to combine the real and virtual worlds (eg. [Schmitt 2014]). This change from measurement as a quality control tool to a fully integrated step in the production process has also changed the requirements for 3D metrology solutions. Key words like MAA (Measurement Assisted Assembly) illustrate that new position of metrology in the industrial production process. At the same time it is obvious that these processes not only require more measurements but also systems to deliver the required information in high density in a short time. Here optical solutions including photogrammetry for 3D measurements have big advantages over traditional mechanical CMM's. The paper describes the relevance of different photogrammetric solutions including state of the art, industry requirements and application examples.

  8. X-ray pulse wavefront metrology using speckle tracking

    International Nuclear Information System (INIS)

    Berujon, Sebastien; Ziegler, Eric; Cloetens, Peter

    2015-01-01

    The theoretical description and experimental implementation of a speckle-tracking-based instrument which permits the characterisation of X-ray pulse wavefronts. An instrument allowing the quantitative analysis of X-ray pulsed wavefronts is presented and its processing method explained. The system relies on the X-ray speckle tracking principle to accurately measure the phase gradient of the X-ray beam from which beam optical aberrations can be deduced. The key component of this instrument, a semi-transparent scintillator emitting visible light while transmitting X-rays, allows simultaneous recording of two speckle images at two different propagation distances from the X-ray source. The speckle tracking procedure for a reference-less metrology mode is described with a detailed account on the advanced processing schemes used. A method to characterize and compensate for the imaging detector distortion, whose principle is also based on speckle, is included. The presented instrument is expected to find interest at synchrotrons and at the new X-ray free-electron laser sources under development worldwide where successful exploitation of beams relies on the availability of an accurate wavefront metrology

  9. INDUSTRIAL PHOTOGRAMMETRY - ACCEPTED METROLOGY TOOL OR EXOTIC NICHE

    Directory of Open Access Journals (Sweden)

    W. Bösemann

    2016-06-01

    Full Text Available New production technologies like 3D printing and other adaptive manufacturing technologies have changed the industrial manufacturing process, often referred to as next industrial revolution or short industry 4.0. Such Cyber Physical Production Systems combine virtual and real world through digitization, model building process simulation and optimization. It is commonly understood that measurement technologies are the key to combine the real and virtual worlds (eg. [Schmitt 2014]. This change from measurement as a quality control tool to a fully integrated step in the production process has also changed the requirements for 3D metrology solutions. Key words like MAA (Measurement Assisted Assembly illustrate that new position of metrology in the industrial production process. At the same time it is obvious that these processes not only require more measurements but also systems to deliver the required information in high density in a short time. Here optical solutions including photogrammetry for 3D measurements have big advantages over traditional mechanical CMM’s. The paper describes the relevance of different photogrammetric solutions including state of the art, industry requirements and application examples.

  10. Development of laser materials processing and laser metrology techniques

    International Nuclear Information System (INIS)

    Kim, Cheol Jung; Chung, Chin Man; Kim, Jeong Mook; Kim, Min Suk; Kim, Kwang Suk; Baik, Sung Hoon; Kim, Seong Ouk; Park, Seung Kyu

    1997-09-01

    The applications of remote laser materials processing and metrology have been investigated in nuclear industry from the beginning of laser invention because they can reduce the risks of workers in the hostile environment by remote operation. The objective of this project is the development of laser material processing and metrology techniques for repairing and inspection to improve the safety of nuclear power plants. As to repairing, we developed our own laser sleeve welding head and innovative optical laser weld monitoring techniques to control the sleeve welding process. Furthermore, we designed and fabricated a 800 W Nd:YAG and a 150 W Excimer laser systems for high power laser materials processing in nuclear industry such as cladding and decontamination. As to inspection, we developed an ESPI and a laser triangulation 3-D profile measurement system for defect detection which can complement ECT and UT inspections. We also developed a scanning laser vibrometer for remote vibration measurement of large structures and tested its performance. (author). 58 refs., 16 tabs., 137 figs

  11. Dual frequency comb metrology with one fiber laser

    Science.gov (United States)

    Zhao, Xin; Takeshi, Yasui; Zheng, Zheng

    2016-11-01

    Optical metrology techniques based on dual optical frequency combs have emerged as a hotly studied area targeting a wide range of applications from optical spectroscopy to microwave and terahertz frequency measurement. Generating two sets of high-quality comb lines with slightly different comb-tooth spacings with high mutual coherence and stability is the key to most of the dual-comb schemes. The complexity and costs of such laser sources and the associated control systems to lock the two frequency combs hinder the wider adoption of such techniques. Here we demonstrate a very simple and rather different approach to tackle such a challenge. By employing novel laser cavity designs in a mode-locked fiber laser, a simple fiber laser setup could emit dual-comb pulse output with high stability and good coherence between the pulse trains. Based on such lasers, comb-tooth-resolved dual-comb optical spectroscopy is demonstrated. Picometer spectral resolving capability could be realized with a fiber-optic setup and a low-cost data acquisition system and standard algorithms. Besides, the frequency of microwave signals over a large range can be determined based on a simple setup. Our results show the capability of such single-fiber-laser-based dual-comb scheme to reduce the complexity and cost of dual-comb systems with excellent quality for different dual-comb applications.

  12. Simulation based mask defect repair verification and disposition

    Science.gov (United States)

    Guo, Eric; Zhao, Shirley; Zhang, Skin; Qian, Sandy; Cheng, Guojie; Vikram, Abhishek; Li, Ling; Chen, Ye; Hsiang, Chingyun; Zhang, Gary; Su, Bo

    2009-10-01

    As the industry moves towards sub-65nm technology nodes, the mask inspection, with increased sensitivity and shrinking critical defect size, catches more and more nuisance and false defects. Increased defect counts pose great challenges in the post inspection defect classification and disposition: which defect is real defect, and among the real defects, which defect should be repaired and how to verify the post-repair defects. In this paper, we address the challenges in mask defect verification and disposition, in particular, in post repair defect verification by an efficient methodology, using SEM mask defect images, and optical inspection mask defects images (only for verification of phase and transmission related defects). We will demonstrate the flow using programmed mask defects in sub-65nm technology node design. In total 20 types of defects were designed including defects found in typical real circuit environments with 30 different sizes designed for each type. The SEM image was taken for each programmed defect after the test mask was made. Selected defects were repaired and SEM images from the test mask were taken again. Wafers were printed with the test mask before and after repair as defect printability references. A software tool SMDD-Simulation based Mask Defect Disposition-has been used in this study. The software is used to extract edges from the mask SEM images and convert them into polygons to save in GDSII format. Then, the converted polygons from the SEM images were filled with the correct tone to form mask patterns and were merged back into the original GDSII design file. This merge is for the purpose of contour simulation-since normally the SEM images cover only small area (~1 μm) and accurate simulation requires including larger area of optical proximity effect. With lithography process model, the resist contour of area of interest (AOI-the area surrounding a mask defect) can be simulated. If such complicated model is not available, a simple

  13. Achromatic Focal Plane Mask for Exoplanet Imaging Coronagraphy

    Science.gov (United States)

    Newman, Kevin Edward; Belikov, Ruslan; Guyon, Olivier; Balasubramanian, Kunjithapatham; Wilson, Dan

    2013-01-01

    Recent advances in coronagraph technologies for exoplanet imaging have achieved contrasts close to 1e10 at 4 lambda/D and 1e-9 at 2 lambda/D in monochromatic light. A remaining technological challenge is to achieve high contrast in broadband light; a challenge that is largely limited by chromaticity of the focal plane mask. The size of a star image scales linearly with wavelength. Focal plane masks are typically the same size at all wavelengths, and must be sized for the longest wavelength in the observational band to avoid starlight leakage. However, this oversized mask blocks useful discovery space from the shorter wavelengths. We present here the design, development, and testing of an achromatic focal plane mask based on the concept of optical filtering by a diffractive optical element (DOE). The mask consists of an array of DOE cells, the combination of which functions as a wavelength filter with any desired amplitude and phase transmission. The effective size of the mask scales nearly linearly with wavelength, and allows significant improvement in the inner working angle of the coronagraph at shorter wavelengths. The design is applicable to almost any coronagraph configuration, and enables operation in a wider band of wavelengths than would otherwise be possible. We include initial results from a laboratory demonstration of the mask with the Phase Induced Amplitude Apodization coronagraph.

  14. A phase mask fiber grating and sensing applications

    Directory of Open Access Journals (Sweden)

    Preecha P. Yupapin

    2003-09-01

    Full Text Available This paper presents an investigation of a fabricated fiber grating device characteristics and its applications, using a phase mask writing technique. The use of a most common UV phase laser (KrF eximer laser, with high intensity light source was focussed to the phase mask for writing on a fiber optic sample. The device (i.e. grating characteristic especially, in sensing application, was investigated. The possibility of using such device for temperature and strain sensors is discussed.

  15. Mask industry quality assessment

    Science.gov (United States)

    Strott, Al; Bassist, Larry

    1994-12-01

    Product quality and timely delivery are two of the most important parameters in determining the success of a mask manufacturing facility. Because of the sensitivity of this data, very little was known about industry performance in these areas until an assessment was authored and presented at the 1993 BACUS Symposium by Larry Regis of Intel Corporation, Neil Paulsen of Intel Corporation, and James A. Reynolds of Reynolds Consulting. This data has been updated and will be published and presented at this year's BACUS Symposium. Contributor identities will again remain protected by utilizing Arthur Andersen & Company to compile the submittals. Participation was consistent with last year's representation of over 75% of the total merchant and captive mask volume in the United States. The data compiled includes shipments, customer return rate, customer return reasons from 1988 through Q2, 1994, performance to schedule, plate survival yield, and throughput time (TPT).

  16. The difficult business model for mask equipment makers and mask infrastructure development support from consortia and governments

    Science.gov (United States)

    Hector, Scott

    2005-11-01

    The extension of optical projection lithography through immersion to patterning features with half pitch face the challenge of being profitable in the small market for mask equipment while encountering significant R&D expenses to bring new generations of mask fabrication equipment to market. The total available market for patterned masks is estimated to be $2.5B to $2.9B per year. The patterned mask market is about 20% of the market size for lithography equipment and materials. The total available market for mask-making equipment is estimated to be about $800M per year. The largest R&D affordability issue arises for the makers of equipment for fabricating masks where total available sales are typically less than ten units per year. SEMATECH has used discounted cash flow models to predict the affordable R&D while maintaining industry accepted internal rates of return. The results have been compared to estimates of the total R&D cost to bring a new generation of mask equipment to market for various types of tools. The analysis revealed that affordability of the required R&D is a significant problem for many suppliers of mask-making equipment. Consortia such as SEMATECH and Selete have played an important role in cost sharing selected mask equipment and material development projects. Governments in the United States, in Europe and in Japan have also helped equipment suppliers with support for R&D. This paper summarizes the challenging business model for mask equipment suppliers and highlight government support for mask equipment and materials development.

  17. Mask strategy at International SEMATECH

    Science.gov (United States)

    Kimmel, Kurt R.

    2002-08-01

    International SEMATECH (ISMT) is a consortium consisting of 13 leading semiconductor manufacturers from around the globe. Its objective is to develop the infrastructure necessary for its member companies to realize the International Technology Roadmap for Semiconductors (ITRS) through efficiencies of shared development resources and knowledge. The largest area of effort is lithography, recognized as a crucial enabler for microelectronics technology progress. Within the Lithography Division, most of the efforts center on mask-related issues. The development strategy at International SEMATCH will be presented and the interlock of lithography projects clarified. Because of the limited size of the mask production equipment market, the business case is weak for aggressive investment commensurate with the pace of the International Technology Roadmap for Semiconductors. With masks becoming the overwhelming component of lithography cost, new ways of reducing or eliminating mask costs are being explored. Will mask technology survive without a strong business case? Will the mask industry limit the growth of the semiconductor industry? Are advanced masks worth their escalating cost? An analysis of mask cost from the perspective of mask value imparted to the user is presented with examples and generic formulas for the reader to apply independently. A key part to the success for both International SEMATECH and the industry globally will be partnerships on both the local level between mask-maker and mask-user, and the macro level where global collaborations will be necessary to resolve technology development cost challenges.

  18. Metrological traceability of holmium oxide solution

    Science.gov (United States)

    Gonçalves, D. E. F.; Gomes, J. F. S.; Alvarenga, A. P. D.; Borges, P. P.; Araujo, T. O.

    2018-03-01

    Holmium oxide solution was prepared as a candidate of certified reference material for spectrophotometer wavelength scale calibration. Here is presented the necessary steps for evaluation of the uncertainty and the establishment of metrological traceability for the production of this material. Preliminary results from the first produced batch are shown.

  19. Metrology Sampling Strategies for Process Monitoring Applications

    KAUST Repository

    Vincent, Tyrone L.; Stirton, James Broc; Poolla, Kameshwar

    2011-01-01

    , economic pressures prompt a reduction in metrology, for both capital and cycle-time reasons. This paper explores the use of modeling and minimum-variance prediction as a method to select the sites for measurement on each wafer. The models are developed

  20. Laser metrology applied to the nuclear maintenance

    International Nuclear Information System (INIS)

    Garrido Garcia, J.; Sarti Fernandez, F.

    2012-01-01

    The development of this paper focuses on providing an overview of the state of the art about laser metrology. This type of equipment combines the measurement philosophy of laser scanning with the great precision of the robotic equipment of auscultation. Getting micron.

  1. Activities of IPEN Nuclear Metrology Laboratory

    International Nuclear Information System (INIS)

    Dias, M.S.; Koskinas, M.F.; Pocobi, E.; Silva, C.A.M.; Machado, R.R.

    1987-01-01

    The activities of IPEN Nuclear Metrology Laboratory, which the principal objective is radionuclides activities determination for supplying sources and standard radioactive solutions in activity are presented. The systems installed, the activity bands and some of standards radionuclides are shown. (C.G.C.) [pt

  2. Advanced metrology by offline SEM data processing

    Science.gov (United States)

    Lakcher, Amine; Schneider, Loïc.; Le-Gratiet, Bertrand; Ducoté, Julien; Farys, Vincent; Besacier, Maxime

    2017-06-01

    Today's technology nodes contain more and more complex designs bringing increasing challenges to chip manufacturing process steps. It is necessary to have an efficient metrology to assess process variability of these complex patterns and thus extract relevant data to generate process aware design rules and to improve OPC models. Today process variability is mostly addressed through the analysis of in-line monitoring features which are often designed to support robust measurements and as a consequence are not always very representative of critical design rules. CD-SEM is the main CD metrology technique used in chip manufacturing process but it is challenged when it comes to measure metrics like tip to tip, tip to line, areas or necking in high quantity and with robustness. CD-SEM images contain a lot of information that is not always used in metrology. Suppliers have provided tools that allow engineers to extract the SEM contours of their features and to convert them into a GDS. Contours can be seen as the signature of the shape as it contains all the dimensional data. Thus the methodology is to use the CD-SEM to take high quality images then generate SEM contours and create a data base out of them. Contours are used to feed an offline metrology tool that will process them to extract different metrics. It was shown in two previous papers that it is possible to perform complex measurements on hotspots at different process steps (lithography, etch, copper CMP) by using SEM contours with an in-house offline metrology tool. In the current paper, the methodology presented previously will be expanded to improve its robustness and combined with the use of phylogeny to classify the SEM images according to their geometrical proximities.

  3. Metrological assurance and traceability for Industry 4.0 and additive manufacturing in Ukraine

    Science.gov (United States)

    Skliarov, Volodymyr; Neyezhmakov, Pavel; Prokopov, Alexander

    2018-03-01

    The national measurement standards from the point of view of traceability of the results of measurement in additive manufacturing in Ukraine are considered in the paper. The metrological characteristics of the national primary measurement standards in the field of geometric, temperature, optical-physical and time-frequency measurements, which took part in international comparisons within COOMET projects, are presented. The accurate geometric, temperature, optical-physical and time-frequency measurements are the key ones in controlling the quality of additive manufacturing. The use of advanced CAD/CAE/CAM systems allows to simulate the process of additive manufacturing at each stage. In accordance with the areas of the technology of additive manufacturing, the ways of improving the national measurement standards of Ukraine for the growing needs of metrology of additive manufacturing are considered.

  4. Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad

    Energy Technology Data Exchange (ETDEWEB)

    Alcock, Simon G., E-mail: simon.alcock@diamond.ac.uk; Nistea, Ioana; Sawhney, Kawal [Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire OX11 0DE (United Kingdom)

    2016-05-15

    We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM’s autocollimator adds into the overall measured value of the mirror’s slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.

  5. Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad

    International Nuclear Information System (INIS)

    Alcock, Simon G.; Nistea, Ioana; Sawhney, Kawal

    2016-01-01

    We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM’s autocollimator adds into the overall measured value of the mirror’s slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.

  6. Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad.

    Science.gov (United States)

    Alcock, Simon G; Nistea, Ioana; Sawhney, Kawal

    2016-05-01

    We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM's autocollimator adds into the overall measured value of the mirror's slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.

  7. Migration from full-head mask to "open-face" mask for immobilization of patients with head and neck cancer.

    Science.gov (United States)

    Li, Guang; Lovelock, D Michael; Mechalakos, James; Rao, Shyam; Della-Biancia, Cesar; Amols, Howard; Lee, Nancy

    2013-09-06

    To provide an alternative device for immobilization of the head while easing claustrophobia and improving comfort, an "open-face" thermoplastic mask was evaluated using video-based optical surface imaging (OSI) and kilovoltage (kV) X-ray radiography. A three-point thermoplastic head mask with a precut opening and reinforced strips was developed. After molding, it provided sufficient visible facial area as the region of interest for OSI. Using real-time OSI, the head motion of ten volunteers in the new mask was evaluated during mask locking and 15minutes lying on the treatment couch. Using a nose mark with reference to room lasers, forced head movement in open-face and full-head masks (with a nose hole) was compared. Five patients with claustrophobia were immobilized with open-face masks, set up using OSI and kV, and treated in 121 fractions, in which 61 fractions were monitored during treatment using real-time OSI. With the open-face mask, head motion was found to be 1.0 ± 0.6 mm and 0.4° ± 0.2° in volunteers during the experiment, and 0.8 ± 0.3 mm and 0.4° ± 0.2° in patients during treatment. These agree with patient motion calculated from pre-/post-treatment OSI and kV data using different anatomical landmarks. In volunteers, the head shift induced by mask-locking was 2.3 ± 1.7 mm and 1.8° ± 0.6°, and the range of forced movements in the open-face and full-head masks were found to be similar. Most (80%) of the volunteers preferred the open-face mask to the full-head mask, while claustrophobic patients could only tolerate the open-face mask. The open-face mask is characterized for its immobilization capability and can immobilize patients sufficiently (< 2 mm) during radiotherapy. It provides a clinical solution to the immobilization of patients with head and neck (HN) cancer undergoing radiotherapy, and is particularly beneficial for claustrophobic patients. This new open-face mask is readily adopted in radiotherapy clinic as a superior alternative to

  8. An alternative method to achieve metrological confirmation in measurement process

    Science.gov (United States)

    Villeta, M.; Rubio, E. M.; Sanz, A.; Sevilla, L.

    2012-04-01

    Metrological confirmation process must be designed and implemented to ensure that metrological characteristics of the measurement system meet metrological requirements of the measurement process. The aim of this paper is to present an alternative method to the traditional metrological requirements about the relationship between tolerance and measurement uncertainty, to develop such confirmation processes. The proposed way to metrological confirmation considers a given inspection task of the measurement process into the manufacturing system, and it is based on the Index of Contamination of the Capability, ICC. Metrological confirmation process is then developed taking into account the producer risks and economic considerations on this index. As a consequence, depending on the capability of the manufacturing process, the measurement system will be or will not be in adequate state of metrological confirmation for the measurement process.

  9. Ambient Optomechanical Alignment and Pupil Metrology for the Flight Instruments Aboard the James Webb Space Telescope

    Science.gov (United States)

    Coulter, Phillip; Beaton, Alexander; Gum, Jeffrey S.; Hadjimichael, Theodore J.; Hayden, Joseph E.; Hummel, Susann; Hylan, Jason E.; Lee, David; Madison, Timothy J.; Maszkiewicz, Michael; hide

    2014-01-01

    The James Webb Space Telescope science instruments are in the final stages of being integrated into the Integrated Science Instrument Module (ISIM) element. Each instrument is tied into a common coordinate system through mechanical references that are used for optical alignment and metrology within ISIM after element-level assembly. In addition, a set of ground support equipment (GSE) consisting of large, precisely calibrated, ambient, and cryogenic structures are used as alignment references and gauges during various phases of integration and test (I&T). This GSE, the flight instruments, and ISIM structure feature different types of complimentary metrology targeting. These GSE targets are used to establish and track six degrees of freedom instrument alignment during I&T in the vehicle coordinate system (VCS). This paper describes the optomechanical metrology conducted during science instrument integration and alignment in the Spacecraft Systems Development and Integration Facility (SSDIF) cleanroom at NASA Goddard Space Flight Center (GSFC). The measurement of each instrument's ambient entrance pupil location in the telescope coordinate system is discussed. The construction of the database of target locations and the development of metrology uncertainties is also discussed.

  10. Complex Pupil Masks for Aberrated Imaging of Closely Spaced Objects

    Science.gov (United States)

    Reddy, A. N. K.; Sagar, D. K.; Khonina, S. N.

    2017-12-01

    Current approach demonstrates the suppression of optical side-lobes and the contraction of the main lobe in the composite image of two object points of the optical system under the influence of defocusing effect when an asymmetric phase edges are imposed over the apodized circular aperture. The resolution of two point sources having different intensity ratio is discussed in terms of the modified Sparrow criterion, functions of the degree of coherence of the illumination, the intensity difference and the degree of asymmetric phase masking. Here we have introduced and explored the effects of focus aberration (defect-of-focus) on the two-point resolution of the optical systems. Results on the aberrated composite image of closely spaced objects with amplitude mask and asymmetric phase masks forms a significant contribution in astronomical and microscopic observations.

  11. Automated hotspot analysis with aerial image CD metrology for advanced logic devices

    Science.gov (United States)

    Buttgereit, Ute; Trautzsch, Thomas; Kim, Min-ho; Seo, Jung-Uk; Yoon, Young-Keun; Han, Hak-Seung; Chung, Dong Hoon; Jeon, Chan-Uk; Meyers, Gary

    2014-09-01

    Continuously shrinking designs by further extension of 193nm technology lead to a much higher probability of hotspots especially for the manufacturing of advanced logic devices. The CD of these potential hotspots needs to be precisely controlled and measured on the mask. On top of that, the feature complexity increases due to high OPC load in the logic mask design which is an additional challenge for CD metrology. Therefore the hotspot measurements have been performed on WLCD from ZEISS, which provides the benefit of reduced complexity by measuring the CD in the aerial image and qualifying the printing relevant CD. This is especially of advantage for complex 2D feature measurements. Additionally, the data preparation for CD measurement becomes more critical due to the larger amount of CD measurements and the increasing feature diversity. For the data preparation this means to identify these hotspots and mark them automatically with the correct marker required to make the feature specific CD measurement successful. Currently available methods can address generic pattern but cannot deal with the pattern diversity of the hotspots. The paper will explore a method how to overcome those limitations and to enhance the time-to-result in the marking process dramatically. For the marking process the Synopsys WLCD Output Module was utilized, which is an interface between the CATS mask data prep software and the WLCD metrology tool. It translates the CATS marking directly into an executable WLCD measurement job including CD analysis. The paper will describe the utilized method and flow for the hotspot measurement. Additionally, the achieved results on hotspot measurements utilizing this method will be presented.

  12. Green binary and phase shifting mask

    Science.gov (United States)

    Shy, S. L.; Hong, Chao-Sin; Wu, Cheng-San; Chen, S. J.; Wu, Hung-Yu; Ting, Yung-Chiang

    2009-12-01

    SixNy/Ni thin film green mask blanks were developed , and are now going to be used to replace general chromium film used for binary mask as well as to replace molydium silicide embedded material for AttPSM for I-line (365 nm), KrF (248 nm), ArF (193 nm) and Contact/Proximity lithography. A bilayer structure of a 1 nm thick opaque, conductive nickel layer and a SixNy layer is proposed for binary and phase-shifting mask. With the good controlling of plasma CVD of SixNy under silane (50 sccm), ammonia (5 sccm) and nitrogen (100 sccm), the pressure is 250 mTorr. and RF frequency 13.56 MHz and power 50 W. SixNy has enough deposition latitude to meet the requirements as an embedded layer for required phase shift 180 degree, and the T% in 193, 248 and 365 nm can be adjusted between 2% to 20% for binary and phase shifting mask usage. Ni can be deposited by E-gun, its sheet resistance Rs is less than 1.435 kΩ/square. Jeol e-beam system and I-line stepper are used to evaluate these thin film green mask blanks, feature size less than 200 nm half pitch pattern and 0.558 μm pitch contact hole can be printed. Transmission spectrums of various thickness of SixNy film are inspected by using UV spectrometer and FTIR. Optical constants of the SixNy film are measured by n & k meter and surface roughness is inspected by using Atomic Force Microscope (AFM).

  13. Mask fabrication process

    Science.gov (United States)

    Cardinale, Gregory F.

    2000-01-01

    A method for fabricating masks and reticles useful for projection lithography systems. An absorber layer is conventionally patterned using a pattern and etch process. Following the step of patterning, the entire surface of the remaining top patterning photoresist layer as well as that portion of an underlying protective photoresist layer where absorber material has been etched away is exposed to UV radiation. The UV-exposed regions of the protective photoresist layer and the top patterning photoresist layer are then removed by solution development, thereby eliminating the need for an oxygen plasma etch and strip and chances for damaging the surface of the substrate or coatings.

  14. X-ray masks

    International Nuclear Information System (INIS)

    Greenwood, J.C.; Satchell, D.W.

    1984-01-01

    In semiconductor manufacture, where X-ray irradiation is used, a thin silicon membrane can be used as an X-ray mask. This membrane has areas on which are patterns to define the regions to be irradiated. These regions are of antireflection material. With the thin, in the order of 3 microns, membranes used, fragility is a problem. Hence a number of ribs of silicon are formed integral with the membrane, and which are relatively thick, 5 to 10 microns. The ribs may be formed by localised deeper boron deposition followed by a selective etch. (author)

  15. Mask alignment system for semiconductor processing

    Science.gov (United States)

    Webb, Aaron P.; Carlson, Charles T.; Weaver, William T.; Grant, Christopher N.

    2017-02-14

    A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.

  16. Akathisia masked by hypokinesia.

    Science.gov (United States)

    Tuisku, K; Lauerma, H; Holi, M M; Honkonen, T; Rimon, R

    2000-07-01

    Here, we will discuss the concept of subjective akathisia and present a patient case. Our patient was suffering from neuroleptic-induced hypokinesia and akathisia at the same time. The typical motor manifestations of akathisia were masked by hypokinesia, which made the diagnosis difficult. However, the subjective symptoms of akathisia were evident and distressing. Although not observable to bare eye, the pathognomonic pattern of motor activity detected in akathisia was demonstrated by actometric recording. Changing the conventional neuroleptic to an atypical one brought relief to the subjective symptoms of akathisia and hypokinesia, while the motor activity was clearly diminished in actometric recording. Actometric recording may be useful in diagnosing akathisia masked by hypokinesia, but the typical subjective symptoms of akathisia should not be ignored, even when actometry is not available to demonstrate the missing motor component of akathisia. Not only akathisia defined by DSM-IV but also subjective akathisia should be adequately treated to relieve the subjective distress, and to diminish the unfavorable effects on psychotic symptoms, behavior, and drug compliance.

  17. A novel micromachined shadow mask system with self-alignment and gap control capability

    International Nuclear Information System (INIS)

    Hong, Jung Moo; Zou Jun

    2008-01-01

    We present a novel micromachined shadow mask system, which is capable of accurate self-alignment and mask-substrate gap control. The shadow mask system consists of a silicon shadow mask and a silicon carrier wafer with pyramidal cavities fabricated with bulk micromachining. Self-alignment and gap control of the shadow mask and the fabrication substrate can readily be achieved by using matching pairs of pyramidal cavities and steel spheres placed between. The layer-to-layer alignment accuracy of the new shadow mask system has been experimentally characterized and verified using both optical and atomic force microscopic measurements. As an application of this new shadow mask system, an organic thin-film transistor (OTFT) using pentacene as the semiconductor layer has been successfully fabricated and tested

  18. Machine tool metrology an industrial handbook

    CERN Document Server

    Smith, Graham T

    2016-01-01

    Maximizing reader insights into the key scientific disciplines of Machine Tool Metrology, this text will prove useful for the industrial-practitioner and those interested in the operation of machine tools. Within this current level of industrial-content, this book incorporates significant usage of the existing published literature and valid information obtained from a wide-spectrum of manufacturers of plant, equipment and instrumentation before putting forward novel ideas and methodologies. Providing easy to understand bullet points and lucid descriptions of metrological and calibration subjects, this book aids reader understanding of the topics discussed whilst adding a voluminous-amount of footnotes utilised throughout all of the chapters, which adds some additional detail to the subject. Featuring an extensive amount of photographic-support, this book will serve as a key reference text for all those involved in the field. .

  19. Quantum metrology foundation of units and measurements

    CERN Document Server

    Goebel, Ernst O

    2015-01-01

    The International System of Units (SI) is the world's most widely used system of measurement, used every day in commerce and science, and is the modern form of the metric system. It currently comprises the meter (m), the kilogram (kg), the second (s), the ampere (A), the kelvin (K), the candela (cd) and the mole (mol)). The system is changing though, units and unit definitions are modified through international agreements as the technology of measurement progresses, and as the precision of measurements improves. The SI is now being redefined based on constants of nature and their realization by quantum standards. Therefore, the underlying physics and technologies will receive increasing interest, and not only in the metrology community but in all fields of science. This book introduces and explains the applications of modern physics concepts to metrology, the science and the applications of measurements. A special focus is made on the use of quantum standards for the realization of the forthcoming new SI (the...

  20. Metrology for fire experiments in outdoor conditions

    CERN Document Server

    Silvani, Xavier

    2013-01-01

    Natural fires can be considered as scale-dependant, non-linear processes of mass, momentum and heat transport, resulting from a turbulent reactive and radiative fluid medium flowing over a complex medium, the vegetal fuel. In natural outdoor conditions, the experimental study of natural fires at real scale needs the development of an original metrology, one able to capture the large range of time and length scales involved in its dynamic nature and also able to resist the thermal, mechanical and chemical aggression of flames on devices. Robust, accurate and poorly intrusive tools must be carefully set-up and used for gaining very fluctuating data over long periods. These signals also need the development of original post-processing tools that take into account the non-steady nature of their stochastic components. Metrology for Fire Experiments in Outdoor Conditions closely analyzes these features, and also describes measurements techniques, the thermal insulation of fragile electronic systems, data acquisitio...

  1. Coordinate Metrology by Traceable Computed Tomography

    DEFF Research Database (Denmark)

    Müller, Pavel

    is an important factor for decision making about manufactured parts. However, due to many influences in CT, estimation of the uncertainty is a challenge, also because standardized procedures and guidelines are not available yet. In this thesis, several methods for uncertainty estimation were applied in connection......, characterization and correction of measurement errors in the CT volume. Their application appeared to be suitable for this task. Because the two objects consist of ruby spheres and carbon fibre, CT scans did not produce image artifacts, and evaluation of sphere-to-sphere distances was robust. Several methods...... metrology and coordinate metrology and is currently becoming more and more important measuring technique for dimensional measurements. This is mainly due to the fact that with CT, a complete three-dimensional model of the scanned part is in a relatively short time visualized using a computer...

  2. Gloss evaluation from soft and hard metrologies.

    Science.gov (United States)

    Wang, Zihao; Xu, Lihao; Hu, Yu; Mirjalili, Fereshteh; Luo, Ming Ronnier

    2017-09-01

    Recent advances in bidirectional reflectance distribution function (BRDF) acquisitions have provided a novel approach for appearance measurement and analysis. In particular, since gloss appearance is dependent on the directional reflective properties of surfaces, it is reasonable to leverage the BRDF for gloss evaluation. In this paper, we investigate gloss appearance from both soft metrology and hard metrology. A psychophysical experiment was conducted for the gloss assessment of 47 neutral-color samples. In the evaluation of gloss perception from gloss meter measurements, we report several ambiguous correspondences in the medium gloss range. In order to analyze and explain this phenomenon, the BRDF was acquired and examined using a commercial BRDF measuring device. With an improved correlation-to-visual perception, we propose a two-dimensional gloss model by combining a parameter, the standard deviation of the specular lobe, from Ward's BRDF model with measured gloss values.

  3. Intranet and Internet metrological workstation with photonic sensors and transmission

    Science.gov (United States)

    Romaniuk, Ryszard S.; Pozniak, Krzysztof T.; Dybko, Artur

    1999-05-01

    We describe in this paper a part of a telemetric network which consists of a workstation with photonic measurement and communication interfaces, structural fiber optic cabling (10/100BaseFX and CAN-FL), and photonic sensors with fiber optic interfaces. The station is equipped with direct photonic measurement interface and most common measuring standards converter (RS, GPIB) with fiber optic I/O CAN bus, O/E converters, LAN and modem ports. The station was connected to the Intranet (ipx/spx) and Internet (tcp/ip) with separate IP number and DNS, WINS names. Virtual measuring environment system program was written specially for such an Intranet and Internet station. The measurement system program communicated with the user via a Graphical User's Interface (GUI). The user has direct access to all functions of the measuring station system through appropriate layers of GUI: telemetric, transmission, visualization, processing, information, help and steering of the measuring system. We have carried out series of thorough simulation investigations and tests of the station using WWW subsystem of the Internet. We logged into the system through the LAN and via modem. The Internet metrological station works continuously under the address http://nms.ipe.pw.edu.pl/nms. The station and the system hear the short name NMS (from Network Measuring System).

  4. Efficiency improvements of offline metrology job creation

    Science.gov (United States)

    Zuniga, Victor J.; Carlson, Alan; Podlesny, John C.; Knutrud, Paul C.

    1999-06-01

    Progress of the first lot of a new design through the production line is watched very closely. All performance metrics, cycle-time, in-line measurement results and final electrical performance are critical. Rapid movement of this lot through the line has serious time-to-market implications. Having this material waiting at a metrology operation for an engineer to create a measurement job plan wastes valuable turnaround time. Further, efficient use of a metrology system is compromised by the time required to create and maintain these measurement job plans. Thus, having a method to develop metrology job plans prior to the actual running of the material through the manufacture area can significantly improve both cycle time and overall equipment efficiency. Motorola and Schlumberger have worked together to develop and test such a system. The Remote Job Generator (RJG) created job plans for new device sin a manufacturing process from an NT host or workstation, offline. This increases available system tim effort making production measurements, decreases turnaround time on job plan creation and editing, and improves consistency across job plans. Most importantly this allows job plans for new devices to be available before the first wafers of the device arrive at the tool for measurement. The software also includes a database manager which allows updates of existing job plans to incorporate measurement changes required by process changes or measurement optimization. This paper will review the result of productivity enhancements through the increased metrology utilization and decreased cycle time associated with the use of RJG. Finally, improvements in process control through better control of Job Plans across different devices and layers will be discussed.

  5. Digital holography for MEMS and microsystem metrology

    CERN Document Server

    Asundi, Anand

    2011-01-01

    Approaching the topic of digital holography from the practical perspective of industrial inspection, Digital Holography for MEMS and Microsystem Metrology describes the process of digital holography and its growing applications for MEMS characterization, residual stress measurement, design and evaluation, and device testing and inspection. Asundi also provides a thorough theoretical grounding that enables the reader to understand basic concepts and thus identify areas where this technique can be adopted. This combination of both practical and theoretical approach will ensure the

  6. Implementation of the Brazilian radiation metrology network

    International Nuclear Information System (INIS)

    Ramos, Manoel M.O.; Araujo, Margareth M. de

    1998-01-01

    The ever increasing need for calibration of survey, personal, and contamination meters in Brazil are not completely satisfied by the two operating laboratories. To overcome this deficiency a radiation metrology network is being implemented with the support of IAEA. In a near future this network will count other three calibration laboratories which are being installed in different regions of the country, and accredited through INMETRO. (author)

  7. Traceability and uncertainty estimation in coordinate metrology

    DEFF Research Database (Denmark)

    Hansen, Hans Nørgaard; Savio, Enrico; De Chiffre, Leonardo

    2001-01-01

    National and international standards have defined performance verification procedures for coordinate measuring machines (CMMs) that typically involve their ability to measure calibrated lengths and to a certain extent form. It is recognised that, without further analysis or testing, these results...... are required. Depending on the requirements for uncertainty level, different approaches may be adopted to achieve traceability. Especially in the case of complex measurement situations and workpieces the procedures are not trivial. This paper discusses the establishment of traceability in coordinate metrology...

  8. Metrology requirements for the serial production of ELT primary mirror segments

    Science.gov (United States)

    Rees, Paul C. T.; Gray, Caroline

    2015-08-01

    The manufacture of the next generation of large astronomical telescopes, the extremely large telescopes (ELT), requires the rapid manufacture of greater than 500 1.44m hexagonal segments for the primary mirror of each telescope. Both leading projects, the Thirty Meter Telescope (TMT) and the European Extremely Large Telescope (E-ELT), have set highly demanding technical requirements for each fabricated segment. These technical requirements, when combined with the anticipated construction schedule for each telescope, suggest that more than one optical fabricator will be involved in the delivery of the primary mirror segments in order to meet the project schedule. For one supplier, the technical specification is challenging and requires highly consistent control of metrology in close coordination with the polishing technologies used in order to optimize production rates. For production using multiple suppliers, however the supply chain is structured, consistent control of metrology along the supply chain will be required. This requires a broader pattern of independent verification than is the case of a single supplier. This paper outlines the metrology requirements for a single supplier throughout all stages of the fabrication process. We identify and outline those areas where metrology accuracy and duration have a significant impact on production efficiency. We use the challenging ESO E-ELT technical specification as an example of our treatment, including actual process data. We further develop this model for the case of a supply chain consisting of multiple suppliers. Here, we emphasize the need to control metrology throughout the supply chain in order to optimize net production efficiency.

  9. Non-contact distance measurement and profilometry using thermal near-field radiation towards a high resolution inspection and metrology solution

    NARCIS (Netherlands)

    Bijster, R.J.F.; Sadeghian Marnani, H.; van Keulen, A.; Sanchez, M.I.; Ukraintsev, V.A.

    2016-01-01

    Optical near-field technologies such as solid immersion lenses and hyperlenses are candidate solutions for high resolution and high throughput wafer inspection and metrology for the next technology nodes. Besides sub-diffraction limited optical performance, these concepts share the necessity of

  10. The implementation of Mask-Ed: reflections of academic participants.

    Science.gov (United States)

    Reid-Searl, Kerry; Levett-Jones, Tracy; Cooper, Simon; Happell, Brenda

    2014-09-01

    This paper profiles the findings from a study that explored the perspectives and experiences of nurse educators who implemented a novel simulation approach termed Mask-Ed. The technique involves the educator wearing a silicone mask and or body parts and transforming into a character. The premise of this approach is that the masked educator has domain specific knowledge related to the simulation scenario and can transmit this to learners in a way that is engaging, realistic, spontaneous and humanistic. Nurse educators charged with the responsibility of implementing Mask-Ed in three universities were invited to participate in the study by attending an introductory workshop, implementing the technique and then journaling their experiences, insights and perspectives over a 12 month period. The journal entries were then thematically analysed. Key themes were categorised under the headings of Preparation, Implementation and Impact; Reflexivity and Responsiveness; Student Engagement and Ownership; and Teaching and Learning. Mask-Ed is a simulation approach which allows students to interact with the 'characters' in humanistic ways that promote person-centred care and therapeutic communication. This simulation approach holds previously untapped potential for a range of learning experiences, however, to be effective, adequate resourcing, training, preparation and practice is required. Copyright © 2014 Elsevier Ltd. All rights reserved.

  11. A primary mirror metrology system for the GMT

    Science.gov (United States)

    Rakich, A.

    2016-07-01

    The Giant Magellan Telescope (GMT)1 is a 25 m "doubly segmented" telescope composed of seven 8.4 m "unit Gregorian telescopes", on a common mount. Each primary and secondary mirror segment will ideally lie on the geometrical surface of the corresponding rotationally symmetrical full aperture optical element. Therefore, each primary and conjugated secondary mirror segment will feed a common instrument interface, their focal planes co-aligned and cophased. First light with a subset of four unit telescopes is currently scheduled for 2022. The project is currently considering an important aspect of the assembly, integration and verification (AIV) phase of the project. This paper will discuss a dedicated system to directly characterize the on-sky performance of the M1 segments, independently of the M2 subsystem. A Primary Mirror Metrology System (PMS) is proposed. The main purpose of this system will be to he4lp determine the rotation axis of an instrument rotator (the Gregorian Instrument Rotator or GIR in this case) and then to characterize the deflections and deformations of the M1 segments with respect to this axis as a function of gravity and temperature. The metrology system will incorporate a small (180 mm diameter largest element) prime focus corrector (PFC) that simultaneously feeds a risk reduction during AIV; it allows an on-sky characterization of the primary mirror segments and cells, without the complications of other optical elements. The PMS enables a very useful alignment strategy that constrains each primary mirror segments' optical axes to follow the GIR axis to within a few arc seconds. An additional attractive feature of the incorporation of the PMS into the AIV plan, is that it allows first on-sky telescope operations to occur with a system of considerably less optical and control complexity than the final doubly segmented Gregorian telescope configuration. This paper first discusses the strategic rationale for a PMS. Next the system itself is

  12. State preparation for quantum information science and metrology

    International Nuclear Information System (INIS)

    Samblowski, Aiko

    2012-01-01

    The precise preparation of non-classical states of light is a basic requirement for performing quantum information tasks and quantum metrology. Depending on the assignment, the range of required states varies from preparing and modifying squeezed states to generating bipartite entanglement and establishing multimode entanglement networks. Every state needs special preparation techniques and hence it is important to develop the experimental expertise to generate all states with the desired degree of accuracy. In this thesis, the experimental preparation of different kinds of non-classical states of light is demonstrated. Starting with a multimode entangled state, the preparation of an unconditionally generated bound entangled state of light of unprecedented accuracy is shown. Its existence is of fundamental interest, since it certifies an intrinsic irreversibility of entanglement and suggests a connection with thermodynamics. The state is created in a network of linear optics, utilizing optical parametric amplifiers, operated below threshold, beam splitters and phase gates. The experimental platform developed here afforded the precise and stable control of all experimental parameters. Focusing on the aspect of quantum information networks, the generation of suitable bipartite entangled states of light is desirable. The optical connection between atomic transitions and light that can be transmitted via telecommunications fibers opens the possibility to employ quantum memories within fiber networks. For this purpose, a non-degenerate optical parametric oscillator is operated above threshold and the generation of bright bipartite entanglement between its twin beams at the wavelengths of 810 nm and 1550 nm is demonstrated. In the field of metrology, quantum states are used to enhance the measurement precision of interferometric gravitational wave (GW) detectors. Recently, the sensitivity of a GW detector operated at a wavelength of 1064 nm was increased using squeezed

  13. State preparation for quantum information science and metrology

    Energy Technology Data Exchange (ETDEWEB)

    Samblowski, Aiko

    2012-06-08

    The precise preparation of non-classical states of light is a basic requirement for performing quantum information tasks and quantum metrology. Depending on the assignment, the range of required states varies from preparing and modifying squeezed states to generating bipartite entanglement and establishing multimode entanglement networks. Every state needs special preparation techniques and hence it is important to develop the experimental expertise to generate all states with the desired degree of accuracy. In this thesis, the experimental preparation of different kinds of non-classical states of light is demonstrated. Starting with a multimode entangled state, the preparation of an unconditionally generated bound entangled state of light of unprecedented accuracy is shown. Its existence is of fundamental interest, since it certifies an intrinsic irreversibility of entanglement and suggests a connection with thermodynamics. The state is created in a network of linear optics, utilizing optical parametric amplifiers, operated below threshold, beam splitters and phase gates. The experimental platform developed here afforded the precise and stable control of all experimental parameters. Focusing on the aspect of quantum information networks, the generation of suitable bipartite entangled states of light is desirable. The optical connection between atomic transitions and light that can be transmitted via telecommunications fibers opens the possibility to employ quantum memories within fiber networks. For this purpose, a non-degenerate optical parametric oscillator is operated above threshold and the generation of bright bipartite entanglement between its twin beams at the wavelengths of 810 nm and 1550 nm is demonstrated. In the field of metrology, quantum states are used to enhance the measurement precision of interferometric gravitational wave (GW) detectors. Recently, the sensitivity of a GW detector operated at a wavelength of 1064 nm was increased using squeezed

  14. Metrology Techniques for the Assembly of NCSX

    International Nuclear Information System (INIS)

    Priniski, C.; Dodson, T.; Duco, M.; Raftopoulos, S.; Ellis, R.; Brooks, A.

    2009-01-01

    In support of the National Compact Stellerator Experiment (NCSX), stellerator assembly activities continued this past year at the Princeton Plasma Physics Laboratory (PPPL) in partnership with the Oak Ridge National Laboratory (ORNL). The construction program saw the completion of the first two Half Field-Period Assemblies (HPA), each consisting of three modular coils. The full machine includes six such sub-assemblies. A single HPA consists of three of the NCSX modular coils wound and assembled at PPPL. These geometrically-complex three dimensional coils were wound using computer-aided metrology and CAD models to tolerances within +/- 0.5mm. The assembly of these coils required similar accuracy on a larger scale with the added complexity of more individual parts and fewer degrees of freedom for correction. Several new potential positioning issues developed for which measurement and control techniques were developed. To accomplish this, CAD coordinate-based computer metrology equipment and software similar to the solutions employed for winding the modular coils was used. Given the size of the assemblies, the primary tools were both interferometer aided and Absolute Distance Measurement (ADM)-only based laser trackers. In addition, portable Coordinate Measurement Machine (CMM) arms and some novel indirect measurement techniques were employed. This paper will detail both the use of CAD coordinate-based metrology technology and the techniques developed and employed for dimensional control of NSCX subassemblies. The results achieved and possible improvements to techniques will be discussed.

  15. When Bad Masks Turn Good

    Science.gov (United States)

    Abraham, Roberto G.

    In keeping with the spirit of a meeting on ‘masks,' this talk presents two short stories on the theme of dust. In the first, dust plays the familiar role of the evil obscurer, the enemy to bedefeated by the cunning observer in order to allow a key future technology (adaptive optics) to be exploited fully by heroic astronomers. In the second story, dust itself emerges as the improbable hero, in the form of a circumstellar debris disks. I will present evidence of a puzzling near-infrared excess in the continuum of high-redshift galaxies and will argue that the seemingly improbable origin of this IR excess is a population of young circumstellar disks formed around high-mass stars in distant galaxies. Assuming circumstellar disks extend down to lower masses,as they do in our own Galaxy, the excess emission presents us with an exciting opportunity to measure the formation rate of planetary systems in distant galaxies at cosmic epochs before our own solar system formed.

  16. Mask characterization for CDU budget breakdown in advanced EUV lithography

    Science.gov (United States)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2012-11-01

    As the ITRS Critical Dimension Uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and a high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. In this paper we will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for an advanced EUV lithography with 1D and 2D feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CD's and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples in this paper. Also mask stack reflectivity variations should be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We observed also MEEF-through-field fingerprints in the studied EUV cases. Variations of MEEF may also play a role for the total intrafield CDU and may be taken into account for EUV Lithography. We characterized MEEF-through-field for the reviewed features, the results to be discussed in our paper, but further analysis of this phenomenon is required. This comprehensive approach to characterization of the mask part of EUV CDU characterization delivers an accurate and integral CDU Budget

  17. Past and future challenges from a display mask writer perspective

    Science.gov (United States)

    Ekberg, Peter; von Sydow, Axel

    2012-06-01

    Since its breakthrough, the liquid crystal technology has continued to gain momentum and the LCD is today the dominating display type used in desktop monitors, television sets, mobile phones as well as other mobile devices. To improve production efficiency and enable larger screen sizes, the LCD industry has step by step increased the size of the mother glass used in the LCD manufacturing process. Initially the mother glass was only around 0.1 m2 large, but with each generation the size has increased and with generation 10 the area reaches close to 10 m2. The increase in mother glass size has in turn led to an increase in the size of the photomasks used - currently the largest masks are around 1.6 × 1.8 meters. A key mask performance criterion is the absence of "mura" - small systematic errors captured only by the very sensitive human eye. To eliminate such systematic errors, special techniques have been developed by Micronic Mydata. Some mura suppressing techniques are described in this paper. Today, the race towards larger glass sizes has come to a halt and a new race - towards higher resolution and better image quality - is ongoing. The display mask is therefore going through a change that resembles what the semiconductor mask went through some time ago: OPC features are introduced, CD requirements are increasing sharply and multi tone masks (MTMs) are widely used. Supporting this development, Micronic Mydata has introduced a number of compensation methods in the writer, such as Z-correction, CD map and distortion control. In addition, Micronic Mydata MMS15000, the world's most precise large area metrology tool, has played an important role in improving mask placement quality and is briefly described in this paper. Furthermore, proposed specifications and system architecture concept for a new generation mask writers - able to fulfill future image quality requirements - is presented in this paper. This new system would use an AOD/AOM writing engine and be

  18. SEMATECH EUVL mask program status

    Science.gov (United States)

    Yun, Henry; Goodwin, Frank; Huh, Sungmin; Orvek, Kevin; Cha, Brian; Rastegar, Abbas; Kearney, Patrick

    2009-04-01

    As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been

  19. Metrology at the nano scale

    International Nuclear Information System (INIS)

    Sheridan, B.; Cumpson, P.; Bailey, M.

    2006-01-01

    Progress in nano technology relies on ever more accurate measurements of quantities such as distance, force and current industry has long depended on accurate measurement. In the 19th century, for example, the performance of steam engines was seriously limited by inaccurately made components, a situation that was transformed by Henry Maudsley's screw micrometer calliper. And early in the 20th century, the development of telegraphy relied on improved standards of electrical resistance. Before this, each country had its own standards and cross border communication was difficult. The same is true today of nano technology if it is to be fully exploited by industry. Principles of measurement that work well at the macroscopic level often become completely unworkable at the nano metre scale - about 100 nm and below. Imaging, for example, is not possible on this scale using optical microscopes, and it is virtually impossible to weigh a nano metre-scale object with any accuracy. In addition to needing more accurate measurements, nano technology also often requires a greater variety of measurements than conventional technology. For example, standard techniques used to make microchips generally need accurate length measurements, but the manufacture of electronics at the molecular scale requires magnetic, electrical, mechanical and chemical measurements as well. (U.K.)

  20. Slovak Office of Standards, Metrology and Testing. Annual Report 2001

    International Nuclear Information System (INIS)

    2002-01-01

    A brief account of activities carried out by the Slovak Office of Standards, Metrology and Testing of the Slovak Republic in 2001 is presented. These activities are reported under the headings: (1) Introduction by the President of the Slovak Office of Standards, Metrology and Testing; (2) The Vice-president's Unit Standardization and Quality; (3) The President's Office; (4) Chief Inspector Department; (5) Legislative-juridical Department; (6) Department of Economy; (7) Department of International Co-operation; (8) Department of European Integration; (9) Department of Metrology; (10) Department of Testing; (11) Department of the Cyclotron Centre SR; (12) Slovak Institute of Metrology; (13) Slovak Standards Institution; (14) Slovak Metrology Inspectorate; (15) Slovak Legal Metrology; (16) Measuring Techniques - Technocentre - MTT; Abbreviations; (17) Technical Testing Institute Piestany; (18) Testing Institute of Transport and Earthmoving Machinery - SUDST

  1. Deep sub-wavelength metrology for advanced defect classification

    Science.gov (United States)

    van der Walle, P.; Kramer, E.; van der Donck, J. C. J.; Mulckhuyse, W.; Nijsten, L.; Bernal Arango, F. A.; de Jong, A.; van Zeijl, E.; Spruit, H. E. T.; van den Berg, J. H.; Nanda, G.; van Langen-Suurling, A. K.; Alkemade, P. F. A.; Pereira, S. F.; Maas, D. J.

    2017-06-01

    Particle defects are important contributors to yield loss in semi-conductor manufacturing. Particles need to be detected and characterized in order to determine and eliminate their root cause. We have conceived a process flow for advanced defect classification (ADC) that distinguishes three consecutive steps; detection, review and classification. For defect detection, TNO has developed the Rapid Nano (RN3) particle scanner, which illuminates the sample from nine azimuth angles. The RN3 is capable of detecting 42 nm Latex Sphere Equivalent (LSE) particles on XXX-flat Silicon wafers. For each sample, the lower detection limit (LDL) can be verified by an analysis of the speckle signal, which originates from the surface roughness of the substrate. In detection-mode (RN3.1), the signal from all illumination angles is added. In review-mode (RN3.9), the signals from all nine arms are recorded individually and analyzed in order to retrieve additional information on the shape and size of deep sub-wavelength defects. This paper presents experimental and modelling results on the extraction of shape information from the RN3.9 multi-azimuth signal such as aspect ratio, skewness, and orientation of test defects. Both modeling and experimental work confirm that the RN3.9 signal contains detailed defect shape information. After review by RN3.9, defects are coarsely classified, yielding a purified Defect-of-Interest (DoI) list for further analysis on slower metrology tools, such as SEM, AFM or HIM, that provide more detailed review data and further classification. Purifying the DoI list via optical metrology with RN3.9 will make inspection time on slower review tools more efficient.

  2. Metrology for radioactive waste management. (WP2, WP3)

    International Nuclear Information System (INIS)

    Suran, J.

    2014-01-01

    The three-year European research project M etrology for Radioactive Waste Management' was launched in October 2011 under the EMRP (European Metrology Research Programme). It involves 13 European national metrology institutes and a total budget exceeds four million Euros. The project is coordinated by the Czech Metrology Institute and is divided into five working groups. In this presentation the Project is described. (author)

  3. Metrology of variable-line-spacing x-ray gratings using the APS Long Trace Profiler

    Science.gov (United States)

    Sheung, Janet; Qian, Jun; Sullivan, Joseph; Thomasset, Muriel; Manton, Jonathan; Bean, Sunil; Takacs, Peter; Dvorak, Joseph; Assoufid, Lahsen

    2017-09-01

    As resolving power targets have increased with each generation of beamlines commissioned in synchrotron radiation facilities worldwide, diffraction gratings are quickly becoming crucial optical components for meeting performance targets. However, the metrology of variable-line-spacing (VLS) gratings for high resolution beamlines is not widespread; in particular, no metrology facility at any US DOE facility is currently equipped to fully characterize such gratings. To begin to address this issue, the Optics Group at the Advanced Photon Source at Argonne, in collaboration with SOLEIL and with support from Brookhaven National Laboratory (BNL), has developed an alternative beam path addition to the Long Trace Profiler (LTP) at Argonne's Advanced Photon Source. This significantly expands the functionality of the LTP not only to measure mirrors surface slope profile at normal incidence, but also to characterize the groove density of VLS diffraction gratings in the Littrow incidence up to 79°, which covers virtually all diffraction gratings used at synchrotrons in the first order. The LTP light source is a 20mW HeNe laser, which yields enough signal for diffraction measurements to be performed on low angle blazed gratings optimized for soft X-ray wavelengths. We will present the design of the beam path, technical requirements for the optomechanics, and our data analysis procedure. Finally, we discuss challenges still to be overcome and potential limitations with use of the LTP to perform metrology on diffraction gratings.

  4. Fourier fringe analysis and its application to metrology of extreme physical phenomena: a review [Invited].

    Science.gov (United States)

    Takeda, Mitsuo

    2013-01-01

    The paper reviews a technique for fringe analysis referred to as Fourier fringe analysis (FFA) or the Fourier transform method, with a particular focus on its application to metrology of extreme physical phenomena. Examples include the measurement of extremely small magnetic fields with subfluxon sensitivity by electron wave interferometry, subnanometer wavefront evaluation of projection optics for extreme UV lithography, the detection of sub-Ångstrom distortion of a crystal lattice, and the measurement of ultrashort optical pulses in the femotsecond to attosecond range, which show how the advantages of FFA are exploited in these cutting edge applications.

  5. Metrological-grade tunable coherent source in the mid-infrared for molecular precision spectroscopy

    Science.gov (United States)

    Insero, G.; Clivati, C.; D'Ambrosio, D.; Cancio Pastor, P.; Verde, M.; Schunemann, P. G.; Zondy, J.-J.; Inguscio, M.; Calonico, D.; Levi, F.; De Natale, P.; Santambrogio, G.; Borri, S.

    2018-02-01

    We report on a metrological-grade mid-IR source with a 10-14 short-term instability for high-precision spectroscopy. Our source is based on the combination of a quantum cascade laser and a coherent radiation obtained by difference-frequency generation in an orientation-patterned gallium phosphide (OP-GaP) crystal. The pump and signal lasers are locked to an optical frequency comb referenced to the primary frequency standard via an optical fiber link. We demonstrate the robustness of the apparatus by measuring a vibrational transition around 6 μm on a metastable state of CO molecuels with 11 digits of precision.

  6. Geometrical superresolved imaging using nonperiodic spatial masking.

    Science.gov (United States)

    Borkowski, Amikam; Zalevsky, Zeev; Javidi, Bahram

    2009-03-01

    The resolution of every imaging system is limited either by the F-number of its optics or by the geometry of its detection array. The geometrical limitation is caused by lack of spatial sampling points as well as by the shape of every sampling pixel that generates spectral low-pass filtering. We present a novel approach to overcome the low-pass filtering that is due to the shape of the sampling pixels. The approach combines special algorithms together with spatial masking placed in the intermediate image plane and eventually allows geometrical superresolved imaging without relation to the actual shape of the pixels.

  7. Problems of metrological supply of carbon materials production

    International Nuclear Information System (INIS)

    Belov, G.V.; Bazilevskij, L.P.; Cherkashina, N.V.

    1989-01-01

    Carbon materials and products contain internal residual stresses and have an anisotropy of properties therefore special methods of tests are required to control their quality. The main metrological problems during development, production and application of carbon products are: metrological supply of production forms and records during the development of production conditions; metrological supply of quality control of the product; metrological supply of methods for the tests of products and the methods to forecast the characteristics of product quality for the period of quaranteed service life

  8. Video encryption using chaotic masks in joint transform correlator

    Science.gov (United States)

    Saini, Nirmala; Sinha, Aloka

    2015-03-01

    A real-time optical video encryption technique using a chaotic map has been reported. In the proposed technique, each frame of video is encrypted using two different chaotic random phase masks in the joint transform correlator architecture. The different chaotic random phase masks can be obtained either by using different iteration levels or by using different seed values of the chaotic map. The use of different chaotic random phase masks makes the decryption process very complex for an unauthorized person. Optical, as well as digital, methods can be used for video encryption but the decryption is possible only digitally. To further enhance the security of the system, the key parameters of the chaotic map are encoded using RSA (Rivest-Shamir-Adleman) public key encryption. Numerical simulations are carried out to validate the proposed technique.

  9. Video encryption using chaotic masks in joint transform correlator

    International Nuclear Information System (INIS)

    Saini, Nirmala; Sinha, Aloka

    2015-01-01

    A real-time optical video encryption technique using a chaotic map has been reported. In the proposed technique, each frame of video is encrypted using two different chaotic random phase masks in the joint transform correlator architecture. The different chaotic random phase masks can be obtained either by using different iteration levels or by using different seed values of the chaotic map. The use of different chaotic random phase masks makes the decryption process very complex for an unauthorized person. Optical, as well as digital, methods can be used for video encryption but the decryption is possible only digitally. To further enhance the security of the system, the key parameters of the chaotic map are encoded using RSA (Rivest–Shamir–Adleman) public key encryption. Numerical simulations are carried out to validate the proposed technique. (paper)

  10. Model-based MPC enables curvilinear ILT using either VSB or multi-beam mask writers

    Science.gov (United States)

    Pang, Linyong; Takatsukasa, Yutetsu; Hara, Daisuke; Pomerantsev, Michael; Su, Bo; Fujimura, Aki

    2017-07-01

    Inverse Lithography Technology (ILT) is becoming the choice for Optical Proximity Correction (OPC) of advanced technology nodes in IC design and production. Multi-beam mask writers promise significant mask writing time reduction for complex ILT style masks. Before multi-beam mask writers become the main stream working tools in mask production, VSB writers will continue to be the tool of choice to write both curvilinear ILT and Manhattanized ILT masks. To enable VSB mask writers for complex ILT style masks, model-based mask process correction (MB-MPC) is required to do the following: 1). Make reasonable corrections for complex edges for those features that exhibit relatively large deviations from both curvilinear ILT and Manhattanized ILT designs. 2). Control and manage both Edge Placement Errors (EPE) and shot count. 3. Assist in easing the migration to future multi-beam mask writer and serve as an effective backup solution during the transition. In this paper, a solution meeting all those requirements, MB-MPC with GPU acceleration, will be presented. One model calibration per process allows accurate correction regardless of the target mask writer.

  11. A Laser Metrology/Viewing System for ITER In-Vessel Inspection

    International Nuclear Information System (INIS)

    Spampinato, P.T.; Barry, R.E.; Chesser, J.B.; Menon, M.M.; Dagher, M.A.; Slotwinski, A.

    1997-10-01

    This paper identifies the requirements for a remotely operated precision laser ranging system for the International Thermonuclear Experimental Reactor. The inspection system is used for metrology and viewing, and must be capable of achieving submillimeter accuracy and operation in a reactor vessel that has high gamma radiation, high vacuum, elevated temperature, and magnetic field levels. A coherent, frequency modulated laser radar system is under development to meet these requirements. The metrology/viewing sensor consists of a compact laser-optic module linked through fiberoptics to the laser source and imaging units, located outside the harsh environment. The deployment mechanism is a remotely operated telescopic mast. Gamma irradiation up to 10 7 Gy was conducted on critical sensor components with no significant impact to data transmission, and analysis indicates that critical sensor components can operate in a magnetic field with certain design modifications. Plans for testing key components in a magnetic field are underway

  12. Sub-atomic dimensional metrology: developments in the control of x-ray interferometers

    Science.gov (United States)

    Yacoot, Andrew; Kuetgens, Ulrich

    2012-07-01

    Within the European Metrology Research Programme funded project NANOTRACE, the nonlinearity of the next generation of optical interferometers has been measured using x-ray interferometry. The x-ray interferometer can be regarded as a ruler or translation stage whose graduations or displacement steps are based on the lattice spacing of the crystallographic planes from which the x-rays are diffracted: in this case the graduations are every 192 pm corresponding to the spacing between the (2 2 0) planes in silicon. Precise displacement of the x-ray interferometer's monolithic translation stage in steps corresponding to discrete numbers of x-ray fringes requires servo positioning capability at the picometre level. To achieve this very fine control, a digital control system has been developed which has opened up the potential for advances in metrology using x-ray interferometry that include quadrature counting of x-ray fringes.

  13. Sub-atomic dimensional metrology: developments in the control of x-ray interferometers

    International Nuclear Information System (INIS)

    Yacoot, Andrew; Kuetgens, Ulrich

    2012-01-01

    Within the European Metrology Research Programme funded project NANOTRACE, the nonlinearity of the next generation of optical interferometers has been measured using x-ray interferometry. The x-ray interferometer can be regarded as a ruler or translation stage whose graduations or displacement steps are based on the lattice spacing of the crystallographic planes from which the x-rays are diffracted: in this case the graduations are every 192 pm corresponding to the spacing between the (2 2 0) planes in silicon. Precise displacement of the x-ray interferometer's monolithic translation stage in steps corresponding to discrete numbers of x-ray fringes requires servo positioning capability at the picometre level. To achieve this very fine control, a digital control system has been developed which has opened up the potential for advances in metrology using x-ray interferometry that include quadrature counting of x-ray fringes. (paper)

  14. EUV mask manufacturing readiness in the merchant mask industry

    Science.gov (United States)

    Green, Michael; Choi, Yohan; Ham, Young; Kamberian, Henry; Progler, Chris; Tseng, Shih-En; Chiou, Tsann-Bim; Miyazaki, Junji; Lammers, Ad; Chen, Alek

    2017-10-01

    As nodes progress into the 7nm and below regime, extreme ultraviolet lithography (EUVL) becomes critical for all industry participants interested in remaining at the leading edge. One key cost driver for EUV in the supply chain is the reflective EUV mask. As of today, the relatively few end users of EUV consist primarily of integrated device manufactures (IDMs) and foundries that have internal (captive) mask manufacturing capability. At the same time, strong and early participation in EUV by the merchant mask industry should bring value to these chip makers, aiding the wide-scale adoption of EUV in the future. For this, merchants need access to high quality, representative test vehicles to develop and validate their own processes. This business circumstance provides the motivation for merchants to form Joint Development Partnerships (JDPs) with IDMs, foundries, Original Equipment Manufacturers (OEMs) and other members of the EUV supplier ecosystem that leverage complementary strengths. In this paper, we will show how, through a collaborative supplier JDP model between a merchant and OEM, a novel, test chip driven strategy is applied to guide and validate mask level process development. We demonstrate how an EUV test vehicle (TV) is generated for mask process characterization in advance of receiving chip maker-specific designs. We utilize the TV to carry out mask process "stress testing" to define process boundary conditions which can be used to create Mask Rule Check (MRC) rules as well as serve as baseline conditions for future process improvement. We utilize Advanced Mask Characterization (AMC) techniques to understand process capability on designs of varying complexity that include EUV OPC models with and without sub-resolution assist features (SRAFs). Through these collaborations, we demonstrate ways to develop EUV processes and reduce implementation risks for eventual mass production. By reducing these risks, we hope to expand access to EUV mask capability for

  15. Absolute surface reconstruction by slope metrology and photogrammetry

    Science.gov (United States)

    Dong, Yue

    Developing the manufacture of aspheric and freeform optical elements requires an advanced metrology method which is capable of inspecting these elements with arbitrary freeform surfaces. In this dissertation, a new surface measurement scheme is investigated for such a purpose, which is to measure the absolute surface shape of an object under test through its surface slope information obtained by photogrammetric measurement. A laser beam propagating toward the object reflects on its surface while the vectors of the incident and reflected beams are evaluated from the four spots they leave on the two parallel transparent windows in front of the object. The spots' spatial coordinates are determined by photogrammetry. With the knowledge of the incident and reflected beam vectors, the local slope information of the object surface is obtained through vector calculus and finally yields the absolute object surface profile by a reconstruction algorithm. An experimental setup is designed and the proposed measuring principle is experimentally demonstrated by measuring the absolute surface shape of a spherical mirror. The measurement uncertainty is analyzed, and efforts for improvement are made accordingly. In particular, structured windows are designed and fabricated to generate uniform scattering spots left by the transmitted laser beams. Calibration of the fringe reflection instrument, another typical surface slope measurement method, is also reported in the dissertation. Finally, a method for uncertainty analysis of a photogrammetry measurement system by optical simulation is investigated.

  16. Coordinate Measuring Machine for Characterizing Conformal Optics

    National Research Council Canada - National Science Library

    Jacobs, Stephen

    2001-01-01

    ... Nanotech 150AG Aspharic Grinder and the Nanotecnnologv Systems Nanotech 5OOFG Freeform Generator. The unique and complex nature of these parts prevented them from being characterized with standard optical metrology instrumentation...

  17. Improvements in the EQ-10 electrodeless Z-pinch EUV source for metrology applications

    Science.gov (United States)

    Horne, Stephen F.; Gustafson, Deborah; Partlow, Matthew J.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

    2011-04-01

    Now that EUV lithography systems are beginning to ship into the fabs for next generation chips it is more critical that the EUV infrastructure developments are keeping pace. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinch™ light source since 2005. The source is currently being used for metrology, mask inspection, and resist development. These applications require especially stable performance in both power and source size. Over the last 5 years Energetiq has made many source modifications which have included better thermal management as well as high pulse rate operation6. Recently we have further increased the system power handling and electrical pulse reproducibility. The impact of these modifications on source performance will be reported.

  18. Enhacement of intrafield overlay using a design based metrology system

    Science.gov (United States)

    Jo, Gyoyeon; Ji, Sunkeun; Kim, Shinyoung; Kang, Hyunwoo; Park, Minwoo; Kim, Sangwoo; Kim, Jungchan; Park, Chanha; Yang, Hyunjo; Maruyama, Kotaro; Park, Byungjun

    2016-03-01

    As the scales of the semiconductor devices continue to shrink, accurate measurement and control of the overlay have been emphasized for securing more overlay margin. Conventional overlay analysis methods are based on the optical measurement of the overlay mark. However, the overlay data obtained from these optical methods cannot represent the exact misregistration between two layers at the circuit level. The overlay mismatch may arise from the size or pitch difference between the overlay mark and the real pattern. Pattern distortion, caused by CMP or etching, could be a source of the overlay mismatch as well. Another issue is the overlay variation in the real circuit pattern which varies depending on its location. The optical overlay measurement methods, such as IBO and DBO that use overlay mark on the scribeline, are not capable of defining the exact overlay values of the real circuit. Therefore, the overlay values of the real circuit need to be extracted to integrate the semiconductor device properly. The circuit level overlay measurement using CDSEM is time-consuming in extracting enough data to indicate overall trend of the chip. However DBM tool is able to derive sufficient data to display overlay tendency of the real circuit region with high repeatability. An E-beam based DBM(Design Based Metrology) tool can be an alternative overlay measurement method. In this paper, we are going to certify that the overlay values extracted from optical measurement cannot represent the circuit level overlay values. We will also demonstrate the possibility to correct misregistration between two layers using the overlay data obtained from the DBM system.

  19. Metrological large range scanning probe microscope

    International Nuclear Information System (INIS)

    Dai Gaoliang; Pohlenz, Frank; Danzebrink, Hans-Ulrich; Xu Min; Hasche, Klaus; Wilkening, Guenter

    2004-01-01

    We describe a metrological large range scanning probe microscope (LR-SPM) with an Abbe error free design and direct interferometric position measurement capability, aimed at versatile traceable topographic measurements that require nanometer accuracy. A dual-stage positioning system was designed to achieve both a large measurement range and a high measurement speed. This dual-stage system consists of a commercially available stage, referred to as nanomeasuring machine (NMM), with a motion range of 25 mmx25 mmx5 mm along x, y, and z axes, and a compact z-axis piezoelectric positioning stage (compact z stage) with an extension range of 2 μm. The metrological LR-SPM described here senses the surface using a stationary fixed scanning force microscope (SFM) head working in contact mode. During operation, lateral scanning of the sample is performed solely by the NMM. Whereas the z motion, controlled by the SFM signal, is carried out by a combination of the NMM and the compact z stage. In this case the compact z stage, with its high mechanical resonance frequency (greater than 20 kHz), is responsible for the rapid motion while the NMM simultaneously makes slower movements over a larger motion range. To reduce the Abbe offset to a minimum the SFM tip is located at the intersection of three interferometer measurement beams orientated in x, y, and z directions. To improve real time performance two high-end digital signal processing (DSP) systems are used for NMM positioning and SFM servocontrol. Comprehensive DSP firmware and Windows XP-based software are implemented, providing a flexible and user-friendly interface. The instrument is able to perform large area imaging or profile scanning directly without stitching small scanned images. Several measurements on different samples such as flatness standards, nanostep height standards, roughness standards as well as sharp nanoedge samples and 1D gratings demonstrate the outstanding metrological capabilities of the instrument

  20. A novel OPC method to reduce mask volume with yield-aware dissection

    International Nuclear Information System (INIS)

    Xie Chunlei; Chen Ye; Shi Zheng

    2013-01-01

    Growing data volume of masks tremendously increases manufacture cost. The cost increase is partially due to the complicated optical proximity corrections applied on mask design. In this paper, a yield-aware dissection method is presented. Based on the recognition of yield related mask context, the dissection result provides sufficient degrees of freedom to keep fidelity on critical sites while still retaining the frugality of modified designs. Experiments show that the final mask volume using the new method is reduced to about 50% of the conventional method. (semiconductor technology)

  1. 222Rn gas metrology in Latvia

    International Nuclear Information System (INIS)

    Bogucarska, T.; Lapenas, A.

    2004-01-01

    The measurements of radon gas provides in Latvia according with the State radiation monitoring program. The national standard/reference level for the protection of employees and population from exposure to radon Latvia has been accepted. The facilities for calibration of the radon gas measurement instruments and detectors have been established on basic of the Radiation Metrology and Testing Center which is the local SSDL for Baltic Region. The radon measurement instruments and detectors calibration can be performed at the 170-4000 Bq/m 3 range. (author)

  2. Quantum metrology for gravitational wave astronomy.

    Science.gov (United States)

    Schnabel, Roman; Mavalvala, Nergis; McClelland, David E; Lam, Ping K

    2010-11-16

    Einstein's general theory of relativity predicts that accelerating mass distributions produce gravitational radiation, analogous to electromagnetic radiation from accelerating charges. These gravitational waves (GWs) have not been directly detected to date, but are expected to open a new window to the Universe once the detectors, kilometre-scale laser interferometers measuring the distance between quasi-free-falling mirrors, have achieved adequate sensitivity. Recent advances in quantum metrology may now contribute to provide the required sensitivity boost. The so-called squeezed light is able to quantum entangle the high-power laser fields in the interferometer arms, and could have a key role in the realization of GW astronomy.

  3. Aerosol metrology: aerodynamic and electrostatic techniques

    International Nuclear Information System (INIS)

    Prodi, V.

    1988-01-01

    Aerosols play an ever increasing role in science, engineering and especially in industrial and environmental hygiene. They are being studied since a long time, but only recently the progress in aerosol instrumentation has made it possible to pose of aerosol metrology, especially the problem of absolute measurements, as based directly on measurements of fundamental quantities. On the basis of absolute measurements, the hierarchy of standards can be prepared and adequately disseminated. In the aerosol field, the quantities to be measured are mainly size, charge, density, and shape. In this paper a possible standardisation framework for aerosols is proposed, for the main physical quantities

  4. Virtual overlay metrology for fault detection supported with integrated metrology and machine learning

    Science.gov (United States)

    Lee, Hong-Goo; Schmitt-Weaver, Emil; Kim, Min-Suk; Han, Sang-Jun; Kim, Myoung-Soo; Kwon, Won-Taik; Park, Sung-Ki; Ryan, Kevin; Theeuwes, Thomas; Sun, Kyu-Tae; Lim, Young-Wan; Slotboom, Daan; Kubis, Michael; Staecker, Jens

    2015-03-01

    While semiconductor manufacturing moves toward the 7nm node for logic and 15nm node for memory, an increased emphasis has been placed on reducing the influence known contributors have toward the on product overlay budget. With a machine learning technique known as function approximation, we use a neural network to gain insight to how known contributors, such as those collected with scanner metrology, influence the on product overlay budget. The result is a sufficiently trained function that can approximate overlay for all wafers exposed with the lithography system. As a real world application, inline metrology can be used to measure overlay for a few wafers while using the trained function to approximate overlay vector maps for the entire lot of wafers. With the approximated overlay vector maps for all wafers coming off the track, a process engineer can redirect wafers or lots with overlay signatures outside the standard population to offline metrology for excursion validation. With this added flexibility, engineers will be given more opportunities to catch wafers that need to be reworked, resulting in improved yield. The quality of the derived corrections from measured overlay metrology feedback can be improved using the approximated overlay to trigger, which wafers should or shouldn't be, measured inline. As a development or integration engineer the approximated overlay can be used to gain insight into lots and wafers used for design of experiments (DOE) troubleshooting. In this paper we will present the results of a case study that follows the machine learning function approximation approach to data analysis, with production overlay measured on an inline metrology system at SK hynix.

  5. Mechanical alignment of substrates to a mask

    Science.gov (United States)

    Webb, Aaron P.; Carlson, Charles T.; Honan, Michael; Amato, Luigi G.; Grant, Christopher Neil; Strassner, James D.

    2016-11-08

    A plurality of masks is attached to the underside of a mask frame. This attachment is made such that each mask can independently move relative to the mask frame in three directions. This relative movement allows each mask to adjust its position to align with respective alignment pins disposed on a working surface. In one embodiment, each mask is attached to the mask frame using fasteners, where the fasteners have a shaft with a diameter smaller than the diameter of the mounting hole disposed on the mask. A bias element may be used to allow relative movement between the mask and the mask frame in the vertical direction. Each mask may also have kinematic features to mate with the respective alignment pins on the working surface.

  6. La metrología en nuestras vidas

    OpenAIRE

    Jaramillo, Zaira

    2010-01-01

    A primera vista, la palabra "Metrología" nos trae a la mente la idea de condiciones meteorológicas. Nada más alejado de la realidad, porque la Meteorología es la disciplina que se encarga de estudiar las condiciones del tiempo y la Metrología se encarga de estudiar las mediciones.

  7. National Laboratory of Ionizing Radiation Metrology - Brazilian CNEN

    International Nuclear Information System (INIS)

    1992-01-01

    The activities of the Brazilian National Laboratory of Ionizing Radiations Metrology are described. They include research and development of metrological techniques and procedures, the calibration of area radiation monitors, clinical dosemeters and other instruments and the preparation and standardization of reference radioactive sources. 4 figs., 13 tabs

  8. Differential Evolution for Many-Particle Adaptive Quantum Metrology

    NARCIS (Netherlands)

    Lovett, N.B.; Crosnier, C.; Perarnau- Llobet, M.; Sanders, B.

    2013-01-01

    We devise powerful algorithms based on differential evolution for adaptive many-particle quantum metrology. Our new approach delivers adaptive quantum metrology policies for feedback control that are orders-of-magnitude more efficient and surpass the few-dozen-particle limitation arising in methods

  9. Influence of mask type and mask position on the effectiveness of bag-mask ventilation in a neonatal manikin.

    Science.gov (United States)

    Deindl, Philipp; O'Reilly, Megan; Zoller, Katharina; Berger, Angelika; Pollak, Arnold; Schwindt, Jens; Schmölzer, Georg M

    2014-01-01

    Anatomical face mask with an air cushion rim might be placed accidentally in a false orientation on the newborn's face or filled with various amounts of air during neonatal resuscitation. Both false orientation as well as variable filling may reduce a tight seal and therefore hamper effective positive pressure ventilation (PPV). We aimed to measure the influence of mask type and mask position on the effectiveness of PPV. Twenty neonatal staff members delivered PPV to a modified, leak-free manikin. Resuscitation parameters were recorded using a self-inflatable bag PPV with an Intersurgical anatomical air cushion rim face mask (IS) and a size 0/1 Laerdal round face mask. Three different positions of the IS were tested: correct position, 90° and 180° rotation in reference to the midline of the face. IS masks in each correct position on the face but with different inflation of the air cushion (empty, 10, 20 and 30 mL). Mask leak was similar with mask rotation to either 90° or 180° but significantly increased from 27 (13-73) % with an adequate filled IS mask compared to 52 (16-83) % with an emptied air cushion rim. Anatomical-shaped face mask had similar mask leaks compared to round face mask. A wrongly positioned anatomical-shaped mask does not influence mask leak. Mask leak significantly increased once the air cushion rim was empty, which may cause failure in mask PPV.

  10. Image differencing using masked CCD

    International Nuclear Information System (INIS)

    Rushbrooke, J.G.; Ansorge, R.E.; Webber, C.J. St. J.

    1987-01-01

    A charge coupled device has some of its ''pixels'' masked by a material which is opaque to the radiation to which the device is to be exposed, each masked region being employed as a storage zone into which the charge pattern from the unmasked pixels can be transferred to enable a subsequent charge pattern to be established on further exposure of the unmasked pixels. The components of the resulting video signal corresponding to the respective charge patterns read-out from the CCD are subtracted to produce a video signal corresponding to the difference between the two images which formed the respective charge patterns. Alternate rows of pixels may be masked, or chequer-board pattern masking may be employed. In an X-ray imaging system the CCD is coupled to image intensifying and converting means. (author)

  11. Vibrotactile masking through the body.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2014-09-01

    Touches on one hand or forearm can affect tactile sensitivity at contralateral locations on the opposite side of the body. These interactions suggest an intimate connection between the two sides of the body. Here, we explore the effect of masking not across the body but through the body by measuring the effect of a masking stimulus on the back on the tactile sensitivity of the corresponding point on the front. Tactile sensitivity was measured on each side of the stomach, while vibrotactile masking stimulation was applied to one side of the front and to points on the back including the point directly behind the test point on the front. Results were compared to sensitivity, while vibrotactile stimulation was applied to a control site on the shoulder. A reduction in sensitivity of about .8 dB was found that required the masking stimulus to be within about 2 cm of the corresponding point on the back.

  12. Hybrid mask for deep etching

    KAUST Repository

    Ghoneim, Mohamed T.

    2017-01-01

    Deep reactive ion etching is essential for creating high aspect ratio micro-structures for microelectromechanical systems, sensors and actuators, and emerging flexible electronics. A novel hybrid dual soft/hard mask bilayer may be deposited during

  13. Rapid iconic erasure without masking.

    Science.gov (United States)

    Tijus, Charles Albert; Reeves, Adam

    2004-01-01

    We report on the erasure of the iconic memory of an array of 12 black letters flashed on a continuously- present white field. Erasure is accomplished by replacing the 16 ms letter array (frame 1) with a blank white frame for 16 ms (frame 2). The letter array returns in frame 3, with from one to six letters missing. Report of the missing letters is accurate without the blank white frame but is impoverished with it, as if interposing the blank erases the icon. Erasure occurs without any obvious luminance masking, 'mud splashes', pattern masking (backward, forward, or metacontrast), lateral masking, or masking by object substitution. Erasure is greatly decreased if the blank is presented one frame earlier or later. We speculate that erasure is due to a rapid reset of the icon produced by an informational mis-match.

  14. Consultative committee on ionizing radiation: Impact on radionuclide metrology

    International Nuclear Information System (INIS)

    Karam, L.R.; Ratel, G.

    2016-01-01

    In response to the CIPM MRA, and to improve radioactivity measurements in the face of advancing technologies, the CIPM's consultative committee on ionizing radiation developed a strategic approach to the realization and validation of measurement traceability for radionuclide metrology. As a consequence, measurement institutions throughout the world have devoted no small effort to establish radionuclide metrology capabilities, supported by active quality management systems and validated through prioritized participation in international comparisons, providing a varied stakeholder community with measurement confidence. - Highlights: • Influence of CIPM MRA on radionuclide metrology at laboratories around the world. • CCRI strategy: to be the “undisputed hub for ionizing radiation global metrology.” • CCRI Strategic Plan stresses importance of measurement confidence for stakeholder. • NMIs increasing role in radionuclide metrology by designating institutions (DIs). • NMIs and DIs establish quality systems; validate capabilities through comparisons.

  15. High pressure metrology for industrial applications

    Science.gov (United States)

    Sabuga, Wladimir; Rabault, Thierry; Wüthrich, Christian; Pražák, Dominik; Chytil, Miroslav; Brouwer, Ludwig; Ahmed, Ahmed D. S.

    2017-12-01

    To meet the needs of industries using high pressure technologies, in traceable, reliable and accurate pressure measurements, a joint research project of the five national metrology institutes and the university was carried out within the European Metrology Research Programme. In particular, finite element methods were established for stress-strain analysis of elastic and nonlinear elastic-plastic deformation, as well as of contact processes in pressure-measuring piston-cylinder assemblies, and high-pressure components at pressures above 1 GPa. New pressure measuring multipliers were developed and characterised, which allow realisation of the pressure scale up to 1.6 GPa. This characterisation is based on research including measurements of material elastic constants by the resonant ultrasound spectroscopy, hardness of materials of high pressure components, density and viscosity of pressure transmitting liquids at pressures up to 1.4 GPa and dimensional measurements on piston-cylinders. A 1.6 GPa pressure system was created for operation of the 1.6 GPa multipliers and calibration of high pressure transducers. A transfer standard for 1.5 GPa pressure range, based on pressure transducers, was built and tested. Herewith, the project developed the capability of measuring pressures up to 1.6 GPa, from which industrial users can calibrate their pressure measurement devices for accurate measurements up to 1.5 GPa.

  16. A metrology solution for the orthopaedic industry

    International Nuclear Information System (INIS)

    Bills, P; Brown, L; Jiang, X; Blunt, L

    2005-01-01

    Total joint replacement is one of the most common elective surgical procedures performed worldwide, with an estimate of 1.5 million operations performed annually. Currently joint replacements are expected to function for 10-15 years, however, with an increase in life expectancy, and a greater call for knee replacement due to increased activity levels, there is a requirement to improve their function to offer longer term improved quality of life for patients. The amount of wear that a joint incurs is seen as a good indicator of performance, with higher wear rates typically leading to reduced function and premature failure. New technologies and materials are pushing traditional wear assessment methods to their limits, and novel metrology solutions are required to assess wear of joints following in vivo and in vitro use. This paper presents one such measurement technique; a scanning co-ordinate metrology machine for geometrical assessment. A case study is presented to show the application of this technology to a real orthopaedic measurement problem: the wear of components in total knee replacement. This technique shows good results and provides a basis for further developing techniques for geometrical wear assessment of total joint replacements

  17. Metrological challenges introduced by new tolerancing standards

    International Nuclear Information System (INIS)

    Morse, Edward; Peng, Yue; Srinivasan, Vijay; Shakarji, Craig

    2014-01-01

    The recent release of ISO 14405-1 has provided designers with a richer set of specification tools for the size of part features, so that various functional requirements can be captured with greater fidelity. However, these tools also bring new challenges and pitfalls to an inspector using a coordinate metrology system. A sampling strategy that might have worked well in the past could lead to erroneous results that go undetected when used to evaluate these new specifications. In this paper we investigate how measurement strategies for sampled coordinate metrology systems influence different algorithms for the evaluation of these new specifications. Of particular interest are those specifications where the order statistics of feature cross-sections are required. Here the inspector must decide not only how many points are required for an individual cross-section, but the number and spacing of cross-sections measured on the feature. The results of these decisions are compared with an analytic estimate of the ‘true value’ of the measurand specified using this new standard. (paper)

  18. Regional metrology organisations and the JCRB

    International Nuclear Information System (INIS)

    Hetherington, Paul

    2004-01-01

    In 1999, National Metrology Institutes (NMIs) from some 39 countries signed the International Committee of Weights and Measures (CIPM) Mutual Recognition Arrangement (MRA) in Paris. The MRA, drawn up by the CIPM, under the authority given to it in the Metre Convention, was in response to requirements of Governments and Regulators to provide a sound technical foundation for trade agreements. Core objectives of the MRA are to allow for the establishment of the degree of equivalence of national measurement standards and to provide for mutual recognition of calibration certificates issued by NMIs. This presentation will detail the evolution of the MRA. Globally, NMIs are affiliated to Regional Metrology Organisations (RMOs). The key role of the RMOs in the MRA process will be discussed along with the structure and objectives of the various RMOs worldwide. The Joint Committee of the RMOs and the BIPM (JCRB) plays a central part in the effective operation of the MRA. Its tasks, membership and output will also be described

  19. Criterion Validation Testing of Clinical Metrology Instruments for Measuring Degenerative Joint Disease Associated Mobility Impairment in Cats.

    Science.gov (United States)

    Gruen, Margaret E; Griffith, Emily H; Thomson, Andrea E; Simpson, Wendy; Lascelles, B Duncan X

    2015-01-01

    Degenerative joint disease and associated pain are common in cats, particularly in older cats. There is a need for treatment options, however evaluation of putative therapies is limited by a lack of suitable, validated outcome measures that can be used in the target population of client owned cats. The objectives of this study were to evaluate low-dose daily meloxicam for the treatment of pain associated with degenerative joint disease in cats, and further validate two clinical metrology instruments, the Feline Musculoskeletal Pain Index (FMPI) and the Client Specific Outcome Measures (CSOM). Sixty-six client owned cats with degenerative joint disease and owner-reported impairments in mobility were screened and enrolled into a double-masked, placebo-controlled, randomized clinical trial. Following a run-in baseline period, cats were given either placebo or meloxicam for 21 days, then in a masked washout, cats were all given placebo for 21 days. Subsequently, cats were given the opposite treatment, placebo or meloxicam, for 21 days. Cats wore activity monitors throughout the study, owners completed clinical metrology instruments following each period. Activity counts were increased in cats during treatment with daily meloxicam (pdegenerative joint disease.

  20. Self-mixing interferometry: a novel yardstick for mechanical metrology

    Science.gov (United States)

    Donati, Silvano

    2016-11-01

    A novel configuration of interferometry, SMI (self-mixing interferometry), is described in this paper. SMI is attractive because it doesn't require any optical part external to the laser and can be employed in a variety of measurements - indeed it is sometimes indicated as the "interferometer for measuring without an interferometer". On processing the phase carried by the optical field upon propagation to the target under test, a number of applications have been developed, including traditional measurements related to metrology and mechanical engineering - like displacement, distance, small-amplitude vibrations, attitude angles, velocity, as well as new measurements, like mechanical stress-strain hysterisis and microstructure/MEMS electro-mechanical response. In another field, sensing of motility finds direct application in a variety of biophysical measurements, like blood pulsation, respiratory sounds, chest acoustical impedance, and blood velocity profile. And, we may also look at the amplitude of the returning signal in a SMI, and we can measure weak optical echoes - for return loss and isolation factor measurements, CD readout and scroll sensing, and THz-wave detection. Last, the fine details of the SMI waveform reveal physical parameters of the laser like the laser linewidth, coherence length, and alpha factor. Worth to be noted, SMI is also a coherent detection scheme, and measurement close to the quantum limit of received field with minimum detectable displacements of 100 pm/√Hz are currently achieved upon operation on diffusive targets, whereas in detection mode returning signal can be sensed down to attenuations of -80dB.

  1. Optical proximity correction for anamorphic extreme ultraviolet lithography

    Science.gov (United States)

    Clifford, Chris; Lam, Michael; Raghunathan, Ananthan; Jiang, Fan; Fenger, Germain; Adam, Kostas

    2017-10-01

    The change from isomorphic to anamorphic optics in high numerical aperture (NA) extreme ultraviolet (EUV) scanners necessitates changes to the mask data preparation flow. The required changes for each step in the mask tape out process are discussed, with a focus on optical proximity correction (OPC). When necessary, solutions to new problems are demonstrated, and verified by rigorous simulation. Additions to the OPC model include accounting for anamorphic effects in the optics, mask electromagnetics, and mask manufacturing. The correction algorithm is updated to include awareness of anamorphic mask geometry for mask rule checking (MRC). OPC verification through process window conditions is enhanced to test different wafer scale mask error ranges in the horizontal and vertical directions. This work will show that existing models and methods can be updated to support anamorphic optics without major changes. Also, the larger mask size in the Y direction can result in better model accuracy, easier OPC convergence, and designs which are more tolerant to mask errors.

  2. A masking index for quantifying hidden glitches

    OpenAIRE

    Berti-Equille, Laure; Loh, J. M.; Dasu, T.

    2015-01-01

    Data glitches are errors in a dataset. They are complex entities that often span multiple attributes and records. When they co-occur in data, the presence of one type of glitch can hinder the detection of another type of glitch. This phenomenon is called masking. In this paper, we define two important types of masking and propose a novel, statistically rigorous indicator called masking index for quantifying the hidden glitches. We outline four cases of masking: outliers masked by missing valu...

  3. Optics

    CERN Document Server

    Mathieu, Jean Paul

    1975-01-01

    Optics, Parts 1 and 2 covers electromagnetic optics and quantum optics. The first part of the book examines the various of the important properties common to all electromagnetic radiation. This part also studies electromagnetic waves; electromagnetic optics of transparent isotropic and anisotropic media; diffraction; and two-wave and multi-wave interference. The polarization states of light, the velocity of light, and the special theory of relativity are also examined in this part. The second part is devoted to quantum optics, specifically discussing the classical molecular theory of optical p

  4. Measurement configuration optimization for dynamic metrology using Stokes polarimetry

    Science.gov (United States)

    Liu, Jiamin; Zhang, Chuanwei; Zhong, Zhicheng; Gu, Honggang; Chen, Xiuguo; Jiang, Hao; Liu, Shiyuan

    2018-05-01

    As dynamic loading experiments such as a shock compression test are usually characterized by short duration, unrepeatability and high costs, high temporal resolution and precise accuracy of the measurements is required. Due to high temporal resolution up to a ten-nanosecond-scale, a Stokes polarimeter with six parallel channels has been developed to capture such instantaneous changes in optical properties in this paper. Since the measurement accuracy heavily depends on the configuration of the probing beam incident angle and the polarizer azimuth angle, it is important to select an optimal combination from the numerous options. In this paper, a systematic error propagation-based measurement configuration optimization method corresponding to the Stokes polarimeter was proposed. The maximal Frobenius norm of the combinatorial matrix of the configuration error propagating matrix and the intrinsic error propagating matrix is introduced to assess the measurement accuracy. The optimal configuration for thickness measurement of a SiO2 thin film deposited on a Si substrate has been achieved by minimizing the merit function. Simulation and experimental results show a good agreement between the optimal measurement configuration achieved experimentally using the polarimeter and the theoretical prediction. In particular, the experimental result shows that the relative error in the thickness measurement can be reduced from 6% to 1% by using the optimal polarizer azimuth angle when the incident angle is 45°. Furthermore, the optimal configuration for the dynamic metrology of a nickel foil under quasi-dynamic loading is investigated using the proposed optimization method.

  5. Analysis of key technologies for virtual instruments metrology

    Science.gov (United States)

    Liu, Guixiong; Xu, Qingui; Gao, Furong; Guan, Qiuju; Fang, Qiang

    2008-12-01

    Virtual instruments (VIs) require metrological verification when applied as measuring instruments. Owing to the software-centered architecture, metrological evaluation of VIs includes two aspects: measurement functions and software characteristics. Complexity of software imposes difficulties on metrological testing of VIs. Key approaches and technologies for metrology evaluation of virtual instruments are investigated and analyzed in this paper. The principal issue is evaluation of measurement uncertainty. The nature and regularity of measurement uncertainty caused by software and algorithms can be evaluated by modeling, simulation, analysis, testing and statistics with support of powerful computing capability of PC. Another concern is evaluation of software features like correctness, reliability, stability, security and real-time of VIs. Technologies from software engineering, software testing and computer security domain can be used for these purposes. For example, a variety of black-box testing, white-box testing and modeling approaches can be used to evaluate the reliability of modules, components, applications and the whole VI software. The security of a VI can be assessed by methods like vulnerability scanning and penetration analysis. In order to facilitate metrology institutions to perform metrological verification of VIs efficiently, an automatic metrological tool for the above validation is essential. Based on technologies of numerical simulation, software testing and system benchmarking, a framework for the automatic tool is proposed in this paper. Investigation on implementation of existing automatic tools that perform calculation of measurement uncertainty, software testing and security assessment demonstrates the feasibility of the automatic framework advanced.

  6. Metrology for WEST components design and integration optimization

    International Nuclear Information System (INIS)

    Brun, C.; Archambeau, G.; Blanc, L.; Bucalossi, J.; Chantant, M.; Gargiulo, L.; Hermenier, A.; Le, R.; Pilia, A.

    2015-01-01

    Highlights: • Metrology methods. • Interests of metrology campaign to optimize margins by reducing uncertainties. • Assembly problems are solved and validated on a numerical mock up. • Post treatment of full 3DScan of the vacuum vessel. - Abstract: On WEST new components will be implemented in an existing environment, emphasis has to be put on the metrology to optimize the design and the assembly. Hence, at a particular stage of the project, several components have to coexist in the limited vessel. Therefore, all the difficulty consists in validating the mechanical interfaces between existing components and new one; minimize the risk of the assembling and to maximize the plasma volume. The CEA/IRFM takes the opportunity of the ambitious project to sign a partnership with an industrial specialized in multipurpose metrology domains. To optimize the assembly procedure, the IRFM Assembly group works in strong collaboration with its industrial, to define and plan the campaigns of metrology. The paper will illustrate the organization, methods and results of the dedicated metrology campaigns have been defined and carried out in the WEST dis/assembly phase. To conclude, the future needs of metrology at CEA/IRFM will be exposed to define the next steps.

  7. Metrology network: a case study on the metrology network of defense and security from SIBRATEC

    International Nuclear Information System (INIS)

    Pereira, Marisa Ferraz Figueira

    2016-01-01

    This study is focused on understanding the effects of the infrastructure improvement of these laboratories and the role of network management in offering support and metrological services to the defense and security sector enterprises, within the project purposes. It is also aimed identify gaps on offering calibration and, or testing services to supply demands of the defense and security industries, and analyze adequacy of RDS project to demands of defense and security industries, with the purpose to contribute with information for future actions. The experimental research is qualitative type, with exploratory research characteristics, based on case study. It was structured in two parts, involving primary data collection and secondary data. In order to collect the primary data two questionnaires were prepared, one (Questionnaire A) to the five RDS laboratories representatives and other (Questionnaire B) to the contacts of 63 defense and security enterprises which need calibration and test services, possible customers of RDS laboratories. Answers from four representatives of RDS laboratories and from 26 defense and security enterprises were obtained. The collection of secondary data was obtained from documentary research. The analysis was made based on five dimensions defined in order to organize and improve the understanding of the research setting. They are RDS project coverage, regional, network management, metrological traceability and importance and visibility of RDS. The results indicated that the performance of RDS does not interfere, by that time, in the metrological traceability of the products of the defense and security enterprises that participated in the research. (author)

  8. Radionuclide metrology research for nuclear site decommissioning

    Science.gov (United States)

    Judge, S. M.; Regan, P. H.

    2017-11-01

    The safe and cost-effective decommissioning of legacy nuclear sites relies on accurate measurement of the radioactivity content of the waste materials, so that the waste can be assigned to the most appropriate disposal route. Such measurements are a new challenge for the science of radionuclide metrology which was established largely to support routine measurements on operating nuclear sites and other applications such as nuclear medicine. In this paper, we provide a brief summary of the international measurement system that is established to enable nuclear site operators to demonstrate that measurements are accurate, independent and fit for purpose, and highlight some of the projects that are underway to adapt the measurement system to meet the changing demands from the industry.

  9. Coordinate metrology accuracy of systems and measurements

    CERN Document Server

    Sładek, Jerzy A

    2016-01-01

    This book focuses on effective methods for assessing the accuracy of both coordinate measuring systems and coordinate measurements. It mainly reports on original research work conducted by Sladek’s team at Cracow University of Technology’s Laboratory of Coordinate Metrology. The book describes the implementation of different methods, including artificial neural networks, the Matrix Method, the Monte Carlo method and the virtual CMM (Coordinate Measuring Machine), and demonstrates how these methods can be effectively used in practice to gauge the accuracy of coordinate measurements. Moreover, the book includes an introduction to the theory of measurement uncertainty and to key techniques for assessing measurement accuracy. All methods and tools are presented in detail, using suitable mathematical formulations and illustrated with numerous examples. The book fills an important gap in the literature, providing readers with an advanced text on a topic that has been rapidly developing in recent years. The book...

  10. Ionising radiation metrology for the metallurgical industry

    Directory of Open Access Journals (Sweden)

    García-Toraño E.

    2014-01-01

    Full Text Available Every year millions tons of steel are produced worldwide from recycled scrap loads. Although the detection systems in the steelworks prevent most orphan radioactive sources from entering the furnace, there is still the possibility of accidentally melting a radioactive source. The MetroMetal project, carried out in the frame of the European Metrology Research Programme (EMRP, addresses this problem by studying the existing measurement systems, developing sets of reference sources in various matrices (cast steel, slag, fume dust and proposing new detection instruments. This paper presents the key lines of the project and describes the preparation of radioactive sources as well as the intercomparison exercises used to test the calibration and correction methods proposed within the project.

  11. X-ray metrology for ULSI structures

    International Nuclear Information System (INIS)

    Bowen, D. K.; Matney, K. M.; Wormington, M.

    1998-01-01

    Non-destructive X-ray metrological methods are discussed for application to both process development and process control of ULSI structures. X-ray methods can (a) detect the unacceptable levels of internal defects generated by RTA processes in large wafers, (b) accurately measure the thickness and roughness of layers between 1 and 1000 nm thick and (c) can monitor parameters such as crystallographic texture and the roughness of buried interfaces. In this paper we review transmission X-ray topography, thin film texture measurement, grazing-incidence X-ray reflectivity and high-resolution X-ray diffraction. We discuss in particular their suitability as on-line sensors for process control

  12. Low-defect reflective mask blanks for extreme ultraviolet lithography

    International Nuclear Information System (INIS)

    Burkhart, S C; Cerjarn, C; Kearney, P; Mirkarimi, P; Ray-Chaudhuri, A; Walton, C.

    1999-01-01

    Extreme Ultraviolet Lithgraphy (EUVL) is an emerging technology for fabrication of sub-100 nm feature sizes on silicon, following the SIA road map well into the 21st century. The specific EUVL system described is a scanned, projection lithography system with a 4:1 reduction, using a laser plasma EUV source. The mask and all of the system optics are reflective, multilayer mirrors which function in the extreme ultraviolet at 13.4 nm wavelength. Since the masks are imaged to the wafer exposure plane, mask defects greater than 80% of the exposure plane CD (for 4:1 reduction) will in many cases render the mask useless, whereas intervening optics can have defects which are not a printing problem. For the 100 nm node, we must reduce defects to less than 0.01/cm ampersand sup2; at sign 80nm or larger to obtain acceptable mask production yields. We have succeeded in reducing the defects to less than 0.1/cm ampersand sup2; for defects larger than 130 nm detected by visible light inspection tools, however our program goal is to achieve 0.01/cm ampersand sup2; in the near future. More importantly though, we plan to have a detailed understanding of defect origination and the effect on multilayer growth in order to mitigate defects below the 10 -2 /cm ampersand sup2; level on the next generation of mask blank deposition systems. In this paper we will discuss issues and results from the ion-beam multilayer deposition tool, details of the defect detection and characterization facility, and progress on defect printability modeling

  13. Quantum optics, what next?

    Science.gov (United States)

    Cirac, J. Ignacio; Kimble, H. Jeff

    2017-01-01

    Quantum optics is a well-established field that spans from fundamental physics to quantum information science. In the coming decade, areas including computation, communication and metrology are all likely to experience scientific and technological advances supported by this far-reaching research field.

  14. Digital Holography, a metrological tool for quantitative analysis: Trends and future applications

    Science.gov (United States)

    Paturzo, Melania; Pagliarulo, Vito; Bianco, Vittorio; Memmolo, Pasquale; Miccio, Lisa; Merola, Francesco; Ferraro, Pietro

    2018-05-01

    A review on the last achievements of Digital Holography is reported in this paper, showing that this powerful method can be a key metrological tool for the quantitative analysis and non-invasive inspection of a variety of materials, devices and processes. Nowadays, its range of applications has been greatly extended, including the study of live biological matter and biomedical applications. This paper overviews the main progresses and future perspectives of digital holography, showing new optical configurations and investigating the numerical issues to be tackled for the processing and display of quantitative data.

  15. Contralateral tactile masking between forearms.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2014-03-01

    Masking effects have been demonstrated in which tactile sensitivity is affected when one touch is close to another on the body surface. Such effects are likely a result of local lateral inhibitory circuits that sharpen the spatial tuning of a given tactile receptor. Mutually inhibitory pathways have also been demonstrated between cortical tactile maps of the two halves of the body. Occasional reports have indicated that touches on one hand or forearm can affect tactile sensitivity at contralateral locations. Here, we measure the spatial tuning and effect of posture on this contralateral masking effect. Tactile sensitivity was measured on one forearm, while vibrotactile masking stimulation was applied to the opposite arm. Results were compared to sensitivity while vibrotactile stimulation was applied to a control site on the right shoulder. Sensitivity on the forearm was reduced by over 3 dB when the arms were touching and by 0.52 dB when they were held parallel. The masking effect depended on the position of the masking stimulus. Its effectiveness fell off by 1 STD when the stimulus was 29 % of arm length from the corresponding contralateral point. This long-range inhibitory effect in the tactile system suggests a surprisingly intimate relationship between the two sides of the body.

  16. Self-Rescue Mask Training

    CERN Multimedia

    2013-01-01

    Nine new self-rescue mask instructors have been trained since early 2013, which provides CERN with a total of 26 self-rescue mask instructors to date. This will allow us to meet the increasing training needs caused by the Long Shut Down LS1.   The self-rescue mask instructors have trained 1650 persons in 2012 and about 500 persons since the beginning of the year on how to wear the masks properly. We thank all the instructors and all the persons that made this training possible. Please remember that the self-rescue masks training sessions are scheduled as follows: Basic course: Tuesday and Thursday mornings (2 sessions – 8.30 AM and 10.30 AM), duration:  1.30 hour, in French and English – registration via CERN online training catalogue – Course code 077Y00. Refresher training : Monday mornings (2 sessions – 8.30 AM and 10.30 AM), duration: 1.30 hour , in French and English – registration via CERN online training catalogue &...

  17. Applications of surface metrology in firearm identification

    International Nuclear Information System (INIS)

    Zheng, X; Soons, J; Vorburger, T V; Song, J; Renegar, T; Thompson, R

    2014-01-01

    Surface metrology is commonly used to characterize functional engineering surfaces. The technologies developed offer opportunities to improve forensic toolmark identification. Toolmarks are created when a hard surface, the tool, comes into contact with a softer surface and causes plastic deformation. Toolmarks are commonly found on fired bullets and cartridge cases. Trained firearms examiners use these toolmarks to link an evidence bullet or cartridge case to a specific firearm, which can lead to a criminal conviction. Currently, identification is typically based on qualitative visual comparison by a trained examiner using a comparison microscope. In 2009, a report by the National Academies called this method into question. Amongst other issues, they questioned the objectivity of visual toolmark identification by firearms examiners. The National Academies recommended the development of objective toolmark identification criteria and confidence limits. The National Institute of Standards and Technology (NIST) have applied its experience in surface metrology to develop objective identification criteria, measurement methods, and reference artefacts for toolmark identification. NIST developed the Standard Reference Material SRM 2460 standard bullet and SRM 2461 standard cartridge case to facilitate quality control and traceability of identifications performed in crime laboratories. Objectivity is improved through measurement of surface topography and application of unambiguous surface similarity metrics, such as the maximum value (ACCF MAX ) of the areal cross correlation function. Case studies were performed on consecutively manufactured tools, such as gun barrels and breech faces, to demonstrate that, even in this worst case scenario, all the tested tools imparted unique surface topographies that were identifiable. These studies provide scientific support for toolmark evidence admissibility in criminal court cases. (paper)

  18. Plutonium glove boxes - metrology and operational states

    International Nuclear Information System (INIS)

    Thyer, A.M.

    2001-01-01

    The main objective was to undertake a literature review in support of NII's ongoing work in improving safety in the nuclear industry to help define suitable standards of cleanliness for plutonium glove boxes. This is to cover the following areas: existing or proposed national/international standards relating to plutonium glove box cleanliness management; practicable metrology options for assessing the plutonium content of glove boxes; any available dose information relating to the operation of modern and 'old design'; current contamination levels of specific significance (i.e. any accepted level in decommissioning/waste terms, typical criticality limits (if available), any box plutonium loadings that are documented with corresponding operator doses etc.); and, techniques for the decontamination of plutonium glove boxes and their relative effectiveness. This should then form the basis of any further development work undertaken by the UK nuclear industry. Main recommendations are as follows: 1) No information could be found in open literature on acceptable levels of contamination in boxes and action levels for cleanup. If these are not available in closed publications the 2) Where possible, the decontamination methods identified should be tested and dose information recorded against each method to allow informed decisions on which is the optimum technique for a particular form of contamination. 3) Consideration should be given to utilisation of metrology options which have the lowest potential for exposure of operators. Preferred options, may be detection from the outside of boxes using hand-held or permanently located radiation detectors, or semi-intrusive methods such as air-ionisation readings which would require one-off installation of detectors in ductwork

  19. Speckle-based portable device for in-situ metrology of x-ray mirrors at Diamond Light Source

    Science.gov (United States)

    Wang, Hongchang; Kashyap, Yogesh; Zhou, Tunhe; Sawhney, Kawal

    2017-09-01

    For modern synchrotron light sources, the push toward diffraction-limited and coherence-preserved beams demands accurate metrology on X-ray optics. Moreover, it is important to perform in-situ characterization and optimization of X-ray mirrors since their ultimate performance is critically dependent on the working conditions. Therefore, it is highly desirable to develop a portable metrology device, which can be easily implemented on a range of beamlines for in-situ metrology. An X-ray speckle-based portable device for in-situ metrology of synchrotron X-ray mirrors has been developed at Diamond Light Source. Ultra-high angular sensitivity is achieved by scanning the speckle generator in the X-ray beam. In addition to the compact setup and ease of implementation, a user-friendly graphical user interface has been developed to ensure that characterization and alignment of X-ray mirrors is simple and fast. The functionality and feasibility of this device is presented with representative examples.

  20. IT Security Standards and Legal Metrology - Transfer and Validation

    Science.gov (United States)

    Thiel, F.; Hartmann, V.; Grottker, U.; Richter, D.

    2014-08-01

    Legal Metrology's requirements can be transferred into the IT security domain applying a generic set of standardized rules provided by the Common Criteria (ISO/IEC 15408). We will outline the transfer and cross validation of such an approach. As an example serves the integration of Legal Metrology's requirements into a recently developed Common Criteria based Protection Profile for a Smart Meter Gateway designed under the leadership of the Germany's Federal Office for Information Security. The requirements on utility meters laid down in the Measuring Instruments Directive (MID) are incorporated. A verification approach to check for meeting Legal Metrology's requirements by their interpretation through Common Criteria's generic requirements is also presented.

  1. Optical Metrology of Aspheric and Freeform Mirrors, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — The NASA Science Missions Directorate seeks technology for cost-effective high-performance advanced space telescopes for astrophysics and Earth science applications....

  2. Ray-based calibration for the micro optical metrology system

    Science.gov (United States)

    Yin, Yongkai; Wang, Meng; Li, Ameng; Liu, Xiaoli; Peng, Xiang

    2014-05-01

    Fringe projection 3D microscopy (FP-3DM) plays an important role in micro-machining and micro-fabrication. FP-3DM may be realized with quite different arrangements and principles, which make people confused to select an appropriate one for their specific application. This paper introduces the ray-based general imaging model to describe the FP-3DM, which has the potential to get a unified expression for different system arrangements. Meanwhile the dedicated calibration procedure is also presented to realize quantitative 3D imaging. The validity and accuracy of proposed calibration approach is demonstrated with experiments.

  3. 1995 mask industry quality assessment

    Science.gov (United States)

    Bishop, Chris; Strott, Al

    1995-12-01

    The third annual mask industry assessment will again survey various industry companies for key performance measurements in the areas of quality and delivery. This year's assessment is enhanced to include the area of safety and further breakdown of the data into 5-inch vs. 6- inch. The data compiled includes shipments, customer return rate, customer return reason, performance to schedule, plate survival yield, and throughput time (TPT) from 1988 through Q2, 1995. Contributor identities remain protected by utilizing Arthur Andersen & Company to ensure participant confidentiality. Participation in the past included representation of over 75% of the total merchant and captive mask volume in the United States. This year's assessment is expected to result in expanded participation by again inviting all mask suppliers domestically to participate as well as an impact from inviting international suppliers to participate.

  4. Electrostatic mask for active targets

    International Nuclear Information System (INIS)

    Pancin, J; Gangnant, P; Libin, J-F; Raabe, R; Roger, T; Roussel-Chomaz, P; Gibelin, J; Goth, M

    2012-01-01

    Active gas targets have been used in nuclear physics since 30 years. They are promising systems in view of the new exotic beams soon available at facilities like SPIRAL2 or FAIR, but the system can still be improved. One of the main limitation is the dynamic range in energy deposition. The energy deposited per unit length can be 3 decades higher for the beam than for the light reaction products and the risk to saturate the electronics or that the detector spark are not negligible. A simple solution using a wire plane to mask partially the beam is presented here. Some simulation has been realized and some experimental results are shown confirming the feasibility of this wire tunable mask. The mask can be used from full transparency to full opacity without degrading neither the drift electric field of the chamber nor the performances of detection of the beam or the light products.

  5. Optics

    CERN Document Server

    Fincham, W H A

    2013-01-01

    Optics: Ninth Edition Optics: Ninth Edition covers the work necessary for the specialization in such subjects as ophthalmic optics, optical instruments and lens design. The text includes topics such as the propagation and behavior of light; reflection and refraction - their laws and how different media affect them; lenses - thick and thin, cylindrical and subcylindrical; photometry; dispersion and color; interference; and polarization. Also included are topics such as diffraction and holography; the limitation of beams in optical systems and its effects; and lens systems. The book is recommen

  6. Self-masking subtraction tomosynthesis

    International Nuclear Information System (INIS)

    Chakraborty, D.P.; Yester, M.V.; Barnes, G.T.; Lakshminarayanan, A.V.

    1984-01-01

    The authors tested the image quality and dose savings of self-masking subtraction tomosynthesis (SST), which combines digital tomosynthesis with subtraction of a blurred self-mask. High-quality images of the inner ear of a head phantom were obtained at moderate dose savings. Although they were taken with linear motion, they did not exhibit the streaking due to off-fulcrum objects that is characteristic of conventional linear tomography. SST could reduce patient dose by a factor of at least 12 in examinations of the inner ear, and the mechanical aspects can be implemented with moderate modifications of existing instrumentation

  7. What metrology can do to improve the quality of your atmospheric ammonia measurements

    Science.gov (United States)

    Leuenberger, Daiana; Martin, Nicholas A.; Pascale, Céline; Guillevic, Myriam; Ackermann, Andreas; Ferracci, Valerio; Cassidy, Nathan; Hook, Josh; Battersby, Ross M.; Tang, Yuk S.; Stevens, Amy C. M.; Jones, Matthew R.; Braban, Christine F.; Gates, Linda; Hangartner, Markus; Sacco, Paolo; Pagani, Diego; Hoffnagle, John A.; Niederhauser, Bernhard

    2017-04-01

    dependant permeation of a pure substance through a membrane into a stream of pre-purified matrix gas and subsequent dilution to required amount fractions. All relevant parameters are fully traceable to SI-units. Extractive optical analysers can be connected directly to both, stationary and mobile systems for calibration. Moreover, the resulting gas mixture can also be pressurised into coated cylinders by cryo-filling. The mobile system as well as these cylinders can be applied for calibrations of optical instruments in other laboratories and in the field. In addition, an SI-traceable dilution system based on a cascade of critical orifices has been established to dilute NH3 mixtures in the order of μmol/mol stored in cylinders. It is planned to apply this system to calibrate and re-sample gas mixtures in cylinders due to its very economical gas use. Here we present insights into the development of said infrastructure and results performance tests. Moreover, we include results of the study on adsorption/desorption effects in dry as well as humidified matrix gas into the discussion on the generation of reference gas mixtures. Acknowledgement: This work was supported by the European Metrology Research Programme (EMRP). The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union.

  8. Multiple beam mask writers: an industry solution to the write time crisis

    Science.gov (United States)

    Litt, Lloyd C.

    2010-09-01

    The semiconductor industry is under constant pressure to reduce production costs even as technology complexity increases. Lithography represents the most expensive process due to its high capital equipment costs and the implementation of low-k1 lithographic processes, which has added to the complexity of making masks through the greater use of optical proximity correction, pixelated masks, and double or triple patterning. Each of these mask technologies allows the production of semiconductors at future nodes while extending the utility of current immersion tools. Low k1 patterning complexity combined with increased data due to smaller feature sizes is driving extremely long mask write times. While a majority of the industry is willing to accept mask write times of up to 24 hours, evidence suggests that the write times for many masks at the 22 nm node and beyond will be significantly longer. It has been estimated that $50M+ in non-recurring engineering (NRE) costs will be required to develop a multiple beam mask writer system, yet the business case to recover this kind of investment is not strong. Moreover, funding such a development is a high risk for an individual supplier. The problem is compounded by a disconnect between the tool customer (the mask supplier) and the final mask customer that will bear the increased costs if a high speed writer is not available. Since no individual company will likely risk entering this market, some type of industry-wide funding model will be needed. Because SEMATECH's member companies strongly support a multiple beam technology for mask writers to reduce the write time and cost of 193 nm and EUV masks, SEMATECH plans to pursue an advanced mask writer program in 2011 and 2012. In 2010, efforts will focus on identifying a funding model to address the investment to develop such a technology.

  9. Metrology for environment and climate; Metrologie fuer Umwelt und Klima

    Energy Technology Data Exchange (ETDEWEB)

    Sommer, Klaus-Dieter [Physikalisch-Technische Bundesanstalt (PTB), Braunschweig (Germany). Abt. ' Chemische Physik und Explosionsschutz' ; Spitzer, Petra [Physikalisch-Technische Bundesanstalt (PTB), Braunschweig (Germany). Arbeitsgruppe ' Elektrochemie'

    2012-12-15

    The author describes the observation and monitoring systems developed by the EU and the Federal Republic of Germany. In this connection the metrological aims are described in connection with the activities of the PTB. (HSI)

  10. Metrology of radiation protection. Pt. 1. Physical requirements and terminology

    Energy Technology Data Exchange (ETDEWEB)

    Wagner, S R

    1979-10-01

    Starting from a general consideration of the needs for radiation protection the physical requirements of a relevant metrology are developed. The expedient physical quantities are introduced and problems in the realization and dissemination of their units discussed. It is shown that owing to these difficulties, derived or operational quantities have to be developed for the construction and calibration of practical measuring instruments. Finally the relations between the metrology of radiation protection and of medical radiology are pointed out and commented. (orig.).

  11. Sub-50 nm metrology on extreme ultra violet chemically amplified resist—A systematic assessment

    International Nuclear Information System (INIS)

    Maas, D. J.; Herfst, R.; Veldhoven, E. van; Fliervoet, T.; Meessen, J.; Vaenkatesan, V.; Sadeghian, H.

    2015-01-01

    With lithographic patterning dimensions decreasing well below 50 nm, it is of high importance to understand metrology at such small scales. This paper presents results obtained from dense arrays of contact holes (CHs) with various Critical Dimension (CD) between 15 and 50 nm, as patterned in a chemically amplified resist using an ASML EUV scanner and measured at ASML and TNO. To determine the differences between various (local) CD metrology techniques, we conducted an experiment using optical scatterometry, CD-Scanning Electron Microscopy (CD-SEM), Helium ion Microscopy (HIM), and Atomic Force Microscopy (AFM). CD-SEM requires advanced beam scan strategies to mitigate sample charging; the other tools did not need that. We discuss the observed main similarities and differences between the various techniques. To this end, we assessed the spatial frequency content in the raw images for SEM, HIM, and AFM. HIM and AFM resolve the highest spatial frequencies, which are attributed to the more localized probe-sample interaction for these techniques. Furthermore, the SEM, HIM, and AFM waveforms are analyzed in detail. All techniques show good mutual correlation, albeit the reported CD values systematically differ significantly. HIM systematically reports a 25% higher CD uniformity number than CD-SEM for the same arrays of CHs, probably because HIM has a higher resolution than the CD-SEM used in this assessment. A significant speed boost for HIM and AFM is required before these techniques are to serve the demanding industrial metrology applications like optical critical dimension and CD-SEM do nowadays

  12. Metrology in electricity and magnetism: EURAMET activities today and tomorrow

    Science.gov (United States)

    Piquemal, F.; Jeckelmann, B.; Callegaro, L.; Hällström, J.; Janssen, T. J. B. M.; Melcher, J.; Rietveld, G.; Siegner, U.; Wright, P.; Zeier, M.

    2017-10-01

    Metrology dedicated to electricity and magnetism has changed considerably in recent years. It encompasses almost all modern scientific, industrial, and societal challenges, e.g. the revision of the International System of Units, the profound transformation of industry, changes in energy use and generation, health, and environment, as well as nanotechnologies (including graphene and 2D materials) and quantum engineering. Over the same period, driven by the globalization of worldwide trade, the Mutual Recognition Arrangement (referred to as the CIPM MRA) was set up. As a result, the regional metrology organizations (RMOs) of national metrology institutes have grown in significance. EURAMET is the European RMO and has been very prominent in developing a strategic research agenda (SRA) and has established a comprehensive research programme. This paper reviews the highlights of EURAMET in electrical metrology within the European Metrology Research Programme and its main contributions to the CIPM MRA. In 2012 EURAMET undertook an extensive roadmapping exercise for proposed activities for the next decade which will also be discussed in this paper. This work has resulted in a new SRA of the second largest European funding programme: European Metrology Programme for Innovation and Research.

  13. Masked hypertension in diabetes mellitus

    DEFF Research Database (Denmark)

    Franklin, Stanley S; Thijs, Lutgarde; Li, Yan

    2013-01-01

    Although distinguishing features of masked hypertension in diabetics are well known, the significance of antihypertensive treatment on clinical practice decisions has not been fully explored. We analyzed 9691 subjects from the population-based 11-country International Database on Ambulatory Blood...

  14. Optics

    CERN Document Server

    Fincham, W H A

    2013-01-01

    Optics: Eighth Edition covers the work necessary for the specialization in such subjects as ophthalmic optics, optical instruments and lens design. The text includes topics such as the propagation and behavior of light; reflection and refraction - their laws and how different media affect them; lenses - thick and thin, cylindrical and subcylindrical; photometry; dispersion and color; interference; and polarization. Also included are topics such as diffraction and holography; the limitation of beams in optical systems and its effects; and lens systems. The book is recommended for engineering st

  15. Progress in the specification of optical instruments for the measurement of surface form and texture

    Science.gov (United States)

    de Groot, Peter J.

    2014-05-01

    Specifications for confocal microscopes, optical interferometers and other methods of measuring areal surface topography can be confusing and misleading. The emerging ISO 25178 standards, together with the established international vocabulary of metrology, provide a foundation for improved specifications for 3D surface metrology instrumentation. The approach in this paper links instrument specifications to metrological characteristics that can influence a measurement, using consistent definitions of terms, and reference to verification procedures.

  16. Welcome to Surface Topography: Metrology and Properties

    Science.gov (United States)

    Leach, Richard

    2013-11-01

    I am delighted to welcome readers to this inaugural issue of Surface Topography: Metrology and Properties (STMP). In these days of citation indexes and academic reviews, it is a tough, and maybe a brave, job to start a new journal. But the subject area has never been more active and we are seeing genuine breakthroughs in the use of surfaces to control functional performance. Most manufactured parts rely on some form of control of their surface characteristics. The surface is usually defined as that feature on a component or device, which interacts with either the environment in which it is housed (or in which the device operates), or with another surface. The surface topography and material characteristics of a part can affect how fluids interact with it, how the part looks and feels and how two bearing parts will slide together. The need to control, and hence measure, surface features is becoming increasingly important as we move into a miniaturized world. Surface features can become the dominant functional features of a part and may become large in comparison to the overall size of an object. Research into surface texture measurement and characterization has been carried out for over a century and is now more active than ever, especially as new areal surface texture specification standards begin to be introduced. The range of disciplines for which the function of a surface relates to its topography is very diverse; from metal sheet manufacturing to art restoration, from plastic electronics to forensics. Until now, there has been no obvious publishing venue to bring together all these applications with the underlying research and theory, or to unite those working in academia with engineering and industry. Hence the creation of Surface Topography: Metrology and Properties . STMP will publish the best work being done across this broad discipline in one journal, helping researchers to share common themes and highlighting and promoting the extraordinary benefits this

  17. "The Mask Who Wasn't There": Visual Masking Effect with the Perceptual Absence of the Mask

    Science.gov (United States)

    Rey, Amandine Eve; Riou, Benoit; Muller, Dominique; Dabic, Stéphanie; Versace, Rémy

    2015-01-01

    Does a visual mask need to be perceptually present to disrupt processing? In the present research, we proposed to explore the link between perceptual and memory mechanisms by demonstrating that a typical sensory phenomenon (visual masking) can be replicated at a memory level. Experiment 1 highlighted an interference effect of a visual mask on the…

  18. Gestalt grouping and common onset masking.

    Science.gov (United States)

    Kahan, Todd A; Mathis, Katherine M

    2002-11-01

    A four-dot mask that surrounds and is presented simultaneously with a briefly presented target will reduce a person's ability to identity that target if the mask persists beyond target offset and attention is divided (Enns & Di Lollo, 1997, 2000). This masking effect, referred to as common onset masking, reflects reentrant processing in the visual system and can best be explained with a theory of object substitution (Di Lollo, Enns, & Rensink, 2000). In the present experiments, we investigated whether Gestalt grouping variables would influence the strength of common onset masking. The results indicated that (1) masking was impervious to grouping by form, similarity of color, position, luminance polarity, and common region and (2) masking increased with the number of elements in the masking display.

  19. Figuring and Polishing Precision Optical Surfaces, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — The requirements for cost effective manufacturing and metrology of large optical surfaces is instrumental for the success of future NASA programs such as LISA,...

  20. UltraForm Finisher Optical Mandrel Fabrication, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — The requirements for cost effective manufacturing and metrology of normal incidence and grazing incidence X-Ray optical surfaces is instrumental for the success of...

  1. Migration from full‐head mask to “open‐face” mask for immobilization of patients with head and neck cancer

    Science.gov (United States)

    Lovelock, D. Michael; Mechalakos, James; Rao, Shyam; Della‐Biancia, Cesar; Amols, Howard; Lee, Nancy

    2013-01-01

    To provide an alternative device for immobilization of the head while easing claustrophobia and improving comfort, an “open‐face” thermoplastic mask was evaluated using video‐based optical surface imaging (OSI) and kilovoltage (kV) X‐ray radiography. A three‐point thermoplastic head mask with a precut opening and reinforced strips was developed. After molding, it provided sufficient visible facial area as the region of interest for OSI. Using real‐time OSI, the head motion of ten volunteers in the new mask was evaluated during mask locking and 15 minutes lying on the treatment couch. Using a nose mark with reference to room lasers, forced head movement in open‐face and full‐head masks (with a nose hole) was compared. Five patients with claustrophobia were immobilized with open‐face masks, set up using OSI and kV, and treated in 121 fractions, in which 61 fractions were monitored during treatment using real‐time OSI. With the open‐face mask, head motion was found to be 1.0 ± 0.6 mm and 0.4° ± 0.2° in volunteers during the experiment, and 0.8 ± 0.3 mm and 0.4° ± 0.2° in patients during treatment. These agree with patient motion calculated from pre‐/post‐treatment OSI and kV data using different anatomical landmarks. In volunteers, the head shift induced by mask‐locking was 2.3 ± 1.7 mm and 1.8° ± 0.6°, and the range of forced movements in the open‐face and full‐head masks were found to be similar. Most (80%) of the volunteers preferred the open‐face mask to the full‐head mask, while claustrophobic patients could only tolerate the open‐face mask. The open‐face mask is characterized for its immobilization capability and can immobilize patients sufficiently (face mask is readily adopted in radiotherapy clinic as a superior alternative to the standard full‐head mask. PACS numbers: 87.19.xj, 87.63.L‐, 87.59.‐e, 87.55.tg, 87.55.‐x PMID:24036878

  2. Chemical metrology, strategic job for the Chilean Nuclear Energy Commission

    International Nuclear Information System (INIS)

    Gras, Nuri; Munoz, Luis; Cortes, Eduardo

    2001-01-01

    The National Standardization Institute's (INN) Metrology unit prepared a study in 1996 to evaluate the impact of metrological activity in Chile. This study was based on a survey of the supply and demand of metrological services and on studies of the behavior of the production system and technological services in Chile during the period 1990-1996. With the information obtained in this study the economic impact resulting from the lack of a national metrology system could be evaluated. This impact was estimated to be a 5% loss in gross national product equal to 125-500 million dollars because of direct product rejection in the mining, fisheries, agricultural and manufacturing sectors. Chemical measurements are responsible for 50% of these losses. In response to this need and coordinated by the INN, a metrological network of reference laboratories began to operate in 1997 for the principal physical magnitudes (mass, temperature, longitude and force) and a CORFO-FDI project began in 2001 that includes the chemical magnitudes. The Chilean Nuclear Energy Commission, aware of the problem's importance and the amount of economic damage that the country may suffer, as a result of these deficiencies, has formed a Chemical Metrology Unit to provide technical support. It aims to raise the standards of local analytical laboratories by providing international recognition to the export sector. Nuclear analytical techniques are used as reference methods. This work describes the laboratories that are included in this Chemical Metrology Unit and the historical contribution to the development of local analytical chemistry. The national and international projects are described together with the publications they have generated. The quality assurance program applied to the laboratories is described as well, which has led to the accreditation of the analytical chemical assays. The procedures used for validation and calculation of uncertain nuclear methodologies are described together with

  3. Metrology Sampling Strategies for Process Monitoring Applications

    KAUST Repository

    Vincent, Tyrone L.

    2011-11-01

    Shrinking process windows in very large scale integration semiconductor manufacturing have already necessitated the development of control systems capable of addressing sub-lot-level variation. Within-wafer control is the next milestone in the evolution of advanced process control from lot-based and wafer-based control. In order to adequately comprehend and control within-wafer spatial variation, inline measurements must be performed at multiple locations across the wafer. At the same time, economic pressures prompt a reduction in metrology, for both capital and cycle-time reasons. This paper explores the use of modeling and minimum-variance prediction as a method to select the sites for measurement on each wafer. The models are developed using the standard statistical tools of principle component analysis and canonical correlation analysis. The proposed selection method is validated using real manufacturing data, and results indicate that it is possible to significantly reduce the number of measurements with little loss in the information obtained for the process control systems. © 2011 IEEE.

  4. Building versatile bipartite probes for quantum metrology

    Science.gov (United States)

    Farace, Alessandro; De Pasquale, Antonella; Adesso, Gerardo; Giovannetti, Vittorio

    2016-01-01

    We consider bipartite systems as versatile probes for the estimation of transformations acting locally on one of the subsystems. We investigate what resources are required for the probes to offer a guaranteed level of metrological performance, when the latter is averaged over specific sets of local transformations. We quantify such a performance via the average skew information (AvSk), a convex quantity which we compute in closed form for bipartite states of arbitrary dimensions, and which is shown to be strongly dependent on the degree of local purity of the probes. Our analysis contrasts and complements the recent series of studies focused on the minimum, rather than the average, performance of bipartite probes in local estimation tasks, which was instead determined by quantum correlations other than entanglement. We provide explicit prescriptions to characterize the most reliable states maximizing the AvSk, and elucidate the role of state purity, separability and correlations in the classification of optimal probes. Our results can help in the identification of useful resources for sensing, estimation and discrimination applications when complete knowledge of the interaction mechanism realizing the local transformation is unavailable, and access to pure entangled probes is technologically limited.

  5. Metrology of ionizing radiations and environmental measurements

    International Nuclear Information System (INIS)

    Nourreddine, Abdel-Mjid

    2008-01-01

    The subject of radiation protection covers all measurements taken by the authorities to ensure protection of the population and its environment against the harmful effects of ionizing radiation. Dosimetry occupies an important place in this field, because it makes it possible to consider and to quantify the risk of using radiations in accordance with the prescribed limits. In this course, we will review the fundamental concepts used in the metrology and dosimetry of ionizing radiations. After classification of ionizing radiations according to their interactions with biological matter, we will present the various quantities and units brought into play and in particular the new operational quantities that are good estimators raising protection standards. They are directly connected to the annual limits of effective dose and of equivalent dose defined in the French regulation relating to the protection of the population and of workers against ionizing radiations. The average natural exposure of the population in France varies between 2 to 2.5 mSv per year, depending on geographic location. It comes principally from three sources: cosmic radiation, radioactive elements contained in the ground and radioactive elements that we absorb when breathing or eating. Radon, which is a naturally occurring radioactive gas, is a public health risk and represents 30% of the exposure. Finally, we will give some applications of dosimetry and environmental measurements developed recently at RaMsEs/IPHC laboratory of Strasbourg. (author)

  6. Metrological characterization of 3D imaging devices

    Science.gov (United States)

    Guidi, G.

    2013-04-01

    Manufacturers often express the performance of a 3D imaging device in various non-uniform ways for the lack of internationally recognized standard requirements for metrological parameters able to identify the capability of capturing a real scene. For this reason several national and international organizations in the last ten years have been developing protocols for verifying such performance. Ranging from VDI/VDE 2634, published by the Association of German Engineers and oriented to the world of mechanical 3D measurements (triangulation-based devices), to the ASTM technical committee E57, working also on laser systems based on direct range detection (TOF, Phase Shift, FM-CW, flash LADAR), this paper shows the state of the art about the characterization of active range devices, with special emphasis on measurement uncertainty, accuracy and resolution. Most of these protocols are based on special objects whose shape and size are certified with a known level of accuracy. By capturing the 3D shape of such objects with a range device, a comparison between the measured points and the theoretical shape they should represent is possible. The actual deviations can be directly analyzed or some derived parameters can be obtained (e.g. angles between planes, distances between barycenters of spheres rigidly connected, frequency domain parameters, etc.). This paper shows theoretical aspects and experimental results of some novel characterization methods applied to different categories of active 3D imaging devices based on both principles of triangulation and direct range detection.

  7. Building versatile bipartite probes for quantum metrology

    International Nuclear Information System (INIS)

    Farace, Alessandro; Pasquale, Antonella De; Giovannetti, Vittorio; Adesso, Gerardo

    2016-01-01

    We consider bipartite systems as versatile probes for the estimation of transformations acting locally on one of the subsystems. We investigate what resources are required for the probes to offer a guaranteed level of metrological performance, when the latter is averaged over specific sets of local transformations. We quantify such a performance via the average skew information (AvSk), a convex quantity which we compute in closed form for bipartite states of arbitrary dimensions, and which is shown to be strongly dependent on the degree of local purity of the probes. Our analysis contrasts and complements the recent series of studies focused on the minimum, rather than the average, performance of bipartite probes in local estimation tasks, which was instead determined by quantum correlations other than entanglement. We provide explicit prescriptions to characterize the most reliable states maximizing the AvSk, and elucidate the role of state purity, separability and correlations in the classification of optimal probes. Our results can help in the identification of useful resources for sensing, estimation and discrimination applications when complete knowledge of the interaction mechanism realizing the local transformation is unavailable, and access to pure entangled probes is technologically limited. (paper)

  8. Nanomanufacturing metrology for cellulosic nanomaterials: an update

    Science.gov (United States)

    Postek, Michael T.

    2014-08-01

    The development of the metrology and standards for advanced manufacturing of cellulosic nanomaterials (or basically, wood-based nanotechnology) is imperative to the success of this rising economic sector. Wood-based nanotechnology is a revolutionary technology that will create new jobs and strengthen America's forest-based economy through industrial development and expansion. It allows this, previously perceived, low-tech industry to leap-frog directly into high-tech products and processes and thus improves its current economic slump. Recent global investments in nanotechnology programs have led to a deeper appreciation of the high performance nature of cellulose nanomaterials. Cellulose, manufactured to the smallest possible-size ( 2 nm x 100 nm), is a high-value material that enables products to be lighter and stronger; have less embodied energy; utilize no catalysts in the manufacturing, are biologically compatible and, come from a readily renewable resource. In addition to the potential for a dramatic impact on the national economy - estimated to be as much as $250 billion worldwide by 2020 - cellulose-based nanotechnology creates a pathway for expanded and new markets utilizing these renewable materials. The installed capacity associated with the US pulp and paper industry represents an opportunity, with investment, to rapidly move to large scale production of nano-based materials. However, effective imaging, characterization and fundamental measurement science for process control and characterization are lacking at the present time. This talk will discuss some of these needed measurements and potential solutions.

  9. Advanced overlay analysis through design based metrology

    Science.gov (United States)

    Ji, Sunkeun; Yoo, Gyun; Jo, Gyoyeon; Kang, Hyunwoo; Park, Minwoo; Kim, Jungchan; Park, Chanha; Yang, Hyunjo; Yim, Donggyu; Maruyama, Kotaro; Park, Byungjun; Yamamoto, Masahiro

    2015-03-01

    As design rule shrink, overlay has been critical factor for semiconductor manufacturing. However, the overlay error which is determined by a conventional measurement with an overlay mark based on IBO and DBO often does not represent the physical placement error in the cell area. The mismatch may arise from the size or pitch difference between the overlay mark and the cell pattern. Pattern distortion caused by etching or CMP also can be a source of the mismatch. In 2014, we have demonstrated that method of overlay measurement in the cell area by using DBM (Design Based Metrology) tool has more accurate overlay value than conventional method by using an overlay mark. We have verified the reproducibility by measuring repeatable patterns in the cell area, and also demonstrated the reliability by comparing with CD-SEM data. We have focused overlay mismatching between overlay mark and cell area until now, further more we have concerned with the cell area having different pattern density and etch loading. There appears a phenomenon which has different overlay values on the cells with diverse patterning environment. In this paper, the overlay error was investigated from cell edge to center. For this experiment, we have verified several critical layers in DRAM by using improved(Better resolution and speed) DBM tool, NGR3520.

  10. 21 CFR 868.5590 - Scavenging mask.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Scavenging mask. 868.5590 Section 868.5590 Food... DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5590 Scavenging mask. (a) Identification. A scavenging mask is a device positioned over a patient's nose to deliver anesthetic or analgesic gases to the...

  11. Ergonomic evaluation of pilot oxygen mask designs

    NARCIS (Netherlands)

    Lee, W.; Yang, Xiaopeng; Jung, Daehan; Park, Seikwon; Kim, Heeeun; You, Heecheon

    2018-01-01

    A revised pilot oxygen mask design was developed for better fit to the Korean Air Force pilots’ faces. The present study compared an existing pilot oxygen mask and a prototype of the revised mask design with 88 Korean Air Force pilots in terms of subjective discomfort, facial contact pressure,

  12. 21 CFR 868.5580 - Oxygen mask.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a device...

  13. 21 CFR 868.5570 - Nonrebreathing mask.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Nonrebreathing mask. 868.5570 Section 868.5570...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5570 Nonrebreathing mask. (a) Identification. A nonrebreathing mask is a device fitting over a patient's face to administer oxygen. It utilizes...

  14. 21 CFR 868.5600 - Venturi mask.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Venturi mask. 868.5600 Section 868.5600 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5600 Venturi mask. (a) Identification. A venturi mask is a...

  15. Rates of initial acceptance of PAP masks and outcomes of mask switching.

    Science.gov (United States)

    Bachour, Adel; Vitikainen, Pirjo; Maasilta, Paula

    2016-05-01

    Recently, we noticed a considerable development in alleviating problems related to positive airway pressure (PAP) masks. In this study, we report on the initial PAP mask acceptance rates and the effects of mask switching on mask-related symptoms. We prospectively collected all cases of mask switching in our sleep unit for a period of 14 months. At the time of the study, we used ResMed™ CPAP devices and masks. Mask switching was defined as replacing a mask used for at least 1 day with another type of mask. Changing to a different size but keeping the same type of mask did not count as mask switching. Switching outcomes were considered failed if the initial problem persisted or reappeared during the year that followed switching. Our patient pool was 2768. We recorded 343 cases of mask switching among 267 patients. Of the 566 patients who began new PAP therapy, 108 (39 women) had switched masks, yielding an initial mask acceptance rate of 81 %. The reason for switching was poor-fit/uncomfortable mask in 39 %, leak-related in 30 %, outdated model in 25 %, and nasal stuffiness in 6 % of cases; mask switching resolved these problems in 61 %. Mask switching occurred significantly (p = 0.037) more often in women and in new PAP users. The odds ratio for abandoning PAP therapy within 1 year after mask switching was 7.2 times higher (interval 4.7-11.1) than not switching masks. The initial PAP mask acceptance rate was high. Patients who switched their masks are at greater risk for abandoning PAP therapy.

  16. Masking and Partial Masking in Listeners with a High-Frequency Hearing Loss

    NARCIS (Netherlands)

    Smits, J.T.S.; Duifhuis, H.

    1982-01-01

    3 listeners with sensorineural hearing loss ranging from moderate to moderate-severe starting at frequencies higher than 1 kHz participated in two masking experiments and a partial masking experiment. In the first masking experiment, fM = 1 kHz and LM = 50 dB SPL, higher than normal masked

  17. Metrological issues related to BRDF measurements around the specular direction in the particular case of glossy surfaces

    Science.gov (United States)

    Obein, Gaël.; Audenaert, Jan; Ged, Guillaume; Leloup, Frédéric B.

    2015-03-01

    Among the complete bidirectional reflectance distribution function (BRDF), visual gloss is principally related to physical reflection characteristics located around the specular reflection direction. This particular part of the BRDF is usually referred to as the specular peak. A good starting point for the physical description of gloss could be to measure the reflection properties around this specular peak. Unfortunately, such a characterization is not trivial, since for glossy surfaces the width of the specular peak can become very narrow (typically a full width at half maximum inferior to 0.5° is encountered). In result, new BRDF measurement devices with a very small solid angle of detection are being introduced. Yet, differences in the optical design of BRDF measurement instruments engender different measurement results for the same specimen, complicating direct comparison of the measurement results. This issue is addressed in this paper. By way of example, BRDF measurement results of two samples, one being matte and the other one glossy, obtained by use of two high level goniospectrophotometers with a different optical design, are described. Important discrepancies in the results of the glossy sample are discussed. Finally, luminance maps obtained from renderings with the acquired BRDF data are presented, exemplifying the large visual differences that might be obtained. This stresses the metrological aspects that must be known for using BRDF data. Indeed, the comprehension of parameters affecting the measurement results is an inevitable step towards progress in the metrology of surface gloss, and thus towards a better metrology of appearance in general.

  18. Method for making a single-step etch mask for 3D monolithic nanostructures

    International Nuclear Information System (INIS)

    Grishina, D A; Harteveld, C A M; Vos, W L; Woldering, L A

    2015-01-01

    Current nanostructure fabrication by etching is usually limited to planar structures as they are defined by a planar mask. The realization of three-dimensional (3D) nanostructures by etching requires technologies beyond planar masks. We present a method for fabricating a 3D mask that allows one to etch three-dimensional monolithic nanostructures using only CMOS-compatible processes. The mask is written in a hard-mask layer that is deposited on two adjacent inclined surfaces of a Si wafer. By projecting in a single step two different 2D patterns within one 3D mask on the two inclined surfaces, the mutual alignment between the patterns is ensured. Thereby after the mask pattern is defined, the etching of deep pores in two oblique directions yields a three-dimensional structure in Si. As a proof of concept we demonstrate 3D mask fabrication for three-dimensional diamond-like photonic band gap crystals in silicon. The fabricated crystals reveal a broad stop gap in optical reflectivity measurements. We propose how 3D nanostructures with five different Bravais lattices can be realized, namely cubic, tetragonal, orthorhombic, monoclinic and hexagonal, and demonstrate a mask for a 3D hexagonal crystal. We also demonstrate the mask for a diamond-structure crystal with a 3D array of cavities. In general, the 2D patterns on the different surfaces can be completely independently structured and still be in perfect mutual alignment. Indeed, we observe an alignment accuracy of better than 3.0 nm between the 2D mask patterns on the inclined surfaces, which permits one to etch well-defined monolithic 3D nanostructures. (paper)

  19. Hybrid overlay metrology with CDSEM in a BEOL patterning scheme

    Science.gov (United States)

    Leray, Philippe; Jehoul, Christiane; Inoue, Osamu; Okagawa, Yutaka

    2015-03-01

    Overlay metrology accuracy is a major concern for our industry. Advanced logic process require more tighter overlay control for multipatterning schemes. TIS (Tool Induced Shift) and WIS (Wafer Induced Shift) are the main issues for IBO (Image Based Overlay) and DBO (Diffraction Based Overlay). Methods of compensation have been introduced, some are even very efficient to reduce these measured offsets. Another related question is about the overlay target designs. These targets are never fully representative of the design rules, strong efforts have been achieved, but the device cannot be completely duplicated. Ideally, we would like to measure in the device itself to verify the real overlay value. Top down CDSEM can measure critical dimensions of any structure, it is not dependent of specific target design. It can also measure the overlay errors but only in specific cases like LELE (Litho Etch Litho Etch) after final patterning. In this paper, we will revisit the capability of the CDSEM at final patterning by measuring overlay in dedicated targets as well as inside a logic and an SRAM design. In the dedicated overlay targets, we study the measurement differences between design rules gratings and relaxed pitch gratings. These relaxed pitch which are usually used in IBO or DBO targets. Beyond this "simple" LELE case, we will explore the capability of the CDSEM to measure overlay even if not at final patterning, at litho level. We will assess the hybridization of DBO and CDSEM for reference to optical tools after final patterning. We will show that these reference data can be used to validate the DBO overlay results (correctables and residual fingerprints).

  20. Radionuclide metrology: traceability and response to a radiological accident

    Energy Technology Data Exchange (ETDEWEB)

    Tauhata, L.; Cruz, P.A.L. da; Silva, C.J. da; Delgado, J.U.; Oliveira, A.E. de; Oliveira, E.M. de; Poledna, R.; Loureiro, J. dos S.; Ferreira Filho, A.L.; Silva, R.L. da; Filho, O. L.T.; Santos, A.R.L. dos; Veras, E.V. de; Rangel, J. de A.; Quadros, A.L.L.; Araújo, M.T.F. de; Souza, P.S. de; Ruzzarim, A.; Conceição, D.A. da; Iwahara, A., E-mail: palcruz@ird.gov.br [Instituto de Radioproteção e Dosimetria (LNMRI/IRD/CNEN-RJ), Rio de Janeiro, RJ (Brazil). Lab. Nacional de Metrologia das Radiações Ionizantes

    2017-07-01

    In the case of a radiological accident, there are characteristic phases: discovery and initial assistance with first aid; the triage and monitoring of the affected population; the release of the affected people; forward the victims to medical care; as well as the preparation of the report on the accident. In addition, studies and associated researches performed in the later period. Monitors, dosimeters and measuring systems should be calibrated by contaminating radionuclide standards. The radioactive sources used must be metrologically reliable. In Brazil, this function is performed by LNMRI/IRD/CNEN, designated by INMETRO, which Radionuclide Metrology Laboratory is responsible for the standardization and supply of radioactive sources in diverse geometries and matrices. This laboratory has a stock of radionuclide solutions with controlled environmental variables for the preparation of sources, which are calibrated and standardized by mean of primary and secondary systems. It is also responsible for the dissemination of standards and, in order to establish the metrological traceability of national standards, participates in international key-comparisons promoted by BIPM and regional metrology organizations. Internally, it promotes the National Comparison Programs for laboratories for the analysis of environmental samples and the traceability for producing centers of radiopharmaceuticals and Nuclear Medicine Services in the country. The paper presents the demand for {sup 137}Cs related to the radioactive accident in Goiania/Brazil and the significant results for the main radionuclides standardized by the Radionuclide Metrology Laboratory for international key-comparisons and national comparisons to provide metrological traceability. With the obtained results, the LNMRI of Brazil integrates the international metrology BIPM network and fulfills its function of supplying, with about a hundred of radioactive standards, the country's needs in different applications

  1. Radionuclide metrology: traceability and response to a radiological accident

    International Nuclear Information System (INIS)

    Tauhata, L.; Cruz, P.A.L. da; Silva, C.J. da; Delgado, J.U.; Oliveira, A.E. de; Oliveira, E.M. de; Poledna, R.; Loureiro, J. dos S.; Ferreira Filho, A.L.; Silva, R.L. da; Filho, O. L.T.; Santos, A.R.L. dos; Veras, E.V. de; Rangel, J. de A.; Quadros, A.L.L.; Araújo, M.T.F. de; Souza, P.S. de; Ruzzarim, A.; Conceição, D.A. da; Iwahara, A.

    2017-01-01

    In the case of a radiological accident, there are characteristic phases: discovery and initial assistance with first aid; the triage and monitoring of the affected population; the release of the affected people; forward the victims to medical care; as well as the preparation of the report on the accident. In addition, studies and associated researches performed in the later period. Monitors, dosimeters and measuring systems should be calibrated by contaminating radionuclide standards. The radioactive sources used must be metrologically reliable. In Brazil, this function is performed by LNMRI/IRD/CNEN, designated by INMETRO, which Radionuclide Metrology Laboratory is responsible for the standardization and supply of radioactive sources in diverse geometries and matrices. This laboratory has a stock of radionuclide solutions with controlled environmental variables for the preparation of sources, which are calibrated and standardized by mean of primary and secondary systems. It is also responsible for the dissemination of standards and, in order to establish the metrological traceability of national standards, participates in international key-comparisons promoted by BIPM and regional metrology organizations. Internally, it promotes the National Comparison Programs for laboratories for the analysis of environmental samples and the traceability for producing centers of radiopharmaceuticals and Nuclear Medicine Services in the country. The paper presents the demand for 137 Cs related to the radioactive accident in Goiania/Brazil and the significant results for the main radionuclides standardized by the Radionuclide Metrology Laboratory for international key-comparisons and national comparisons to provide metrological traceability. With the obtained results, the LNMRI of Brazil integrates the international metrology BIPM network and fulfills its function of supplying, with about a hundred of radioactive standards, the country's needs in different applications

  2. Effect of measurement error budgets and hybrid metrology on qualification metrology sampling

    Science.gov (United States)

    Sendelbach, Matthew; Sarig, Niv; Wakamoto, Koichi; Kim, Hyang Kyun (Helen); Isbester, Paul; Asano, Masafumi; Matsuki, Kazuto; Osorio, Carmen; Archie, Chas

    2014-10-01

    Until now, metrologists had no statistics-based method to determine the sampling needed for an experiment before the start that accuracy experiment. We show a solution to this problem called inverse total measurement uncertainty (TMU) analysis, by presenting statistically based equations that allow the user to estimate the needed sampling after providing appropriate inputs, allowing him to make important "risk versus reward" sampling, cost, and equipment decisions. Application examples using experimental data from scatterometry and critical dimension scanning electron microscope tools are used first to demonstrate how the inverse TMU analysis methodology can be used to make intelligent sampling decisions and then to reveal why low sampling can lead to unstable and misleading results. One model is developed that can help experimenters minimize sampling costs. A second cost model reveals the inadequacy of some current sampling practices-and the enormous costs associated with sampling that provides reasonable levels of certainty in the result. We introduce the strategies on how to manage and mitigate these costs and begin the discussion on how fabs are able to manufacture devices using minimal reference sampling when qualifying metrology steps. Finally, the relationship between inverse TMU analysis and hybrid metrology is explored.

  3. EMRP JRP MetNH3: Towards a Consistent Metrological Infrastructure for Ammonia Measurements in Ambient Air

    Science.gov (United States)

    Leuenberger, Daiana; Balslev-Harder, David; Braban, Christine F.; Ebert, Volker; Ferracci, Valerio; Gieseking, Bjoern; Hieta, Tuomas; Martin, Nicholas A.; Pascale, Céline; Pogány, Andrea; Tiebe, Carlo; Twigg, Marsailidh M.; Vaittinen, Olavi; van Wijk, Janneke; Wirtz, Klaus; Niederhauser, Bernhard

    2016-04-01

    aimed uncertainty is develop and characterise laser based optical spectrometric standards Evaluation and characterisation of the applicability of a newly developed open-path as well as of existing extractive measurement techniques as optical transfer standards according to metrological standards. To establish the transfer from high-accuracy standards to field applicable methods Employment of characterised exposure chambers as well as field sites for validation and comparison experiments to test and evaluate the performance of different instruments and measurement methods at ammonia amount fractions of the ambient air. The active exchange in workshops and inter-comparisons, publications in technical journals as well as presentations at relevant conferences and standardisation bodies will transfer the knowledge to stakeholders and end-users. The work has been carried out in the framework of the EMRP. The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union.

  4. Efficient analysis of three dimensional EUV mask induced imaging artifacts using the waveguide decomposition method

    Science.gov (United States)

    Shao, Feng; Evanschitzky, Peter; Fühner, Tim; Erdmann, Andreas

    2009-10-01

    This paper employs the Waveguide decomposition method as an efficient rigorous electromagnetic field (EMF) solver to investigate three dimensional mask-induced imaging artifacts in EUV lithography. The major mask diffraction induced imaging artifacts are first identified by applying the Zernike analysis of the mask nearfield spectrum of 2D lines/spaces. Three dimensional mask features like 22nm semidense/dense contacts/posts, isolated elbows and line-ends are then investigated in terms of lithographic results. After that, the 3D mask-induced imaging artifacts such as feature orientation dependent best focus shift, process window asymmetries, and other aberration-like phenomena are explored for the studied mask features. The simulation results can help lithographers to understand the reasons of EUV-specific imaging artifacts and to devise illumination and feature dependent strategies for their compensation in the optical proximity correction (OPC) for EUV masks. At last, an efficient approach using the Zernike analysis together with the Waveguide decomposition technique is proposed to characterize the impact of mask properties for the future OPC process.

  5. Ion beam deposition system for depositing low defect density extreme ultraviolet mask blanks

    Science.gov (United States)

    Jindal, V.; Kearney, P.; Sohn, J.; Harris-Jones, J.; John, A.; Godwin, M.; Antohe, A.; Teki, R.; Ma, A.; Goodwin, F.; Weaver, A.; Teora, P.

    2012-03-01

    Extreme ultraviolet lithography (EUVL) is the leading next-generation lithography (NGL) technology to succeed optical lithography at the 22 nm node and beyond. EUVL requires a low defect density reflective mask blank, which is considered to be one of the top two critical technology gaps for commercialization of the technology. At the SEMATECH Mask Blank Development Center (MBDC), research on defect reduction in EUV mask blanks is being pursued using the Veeco Nexus deposition tool. The defect performance of this tool is one of the factors limiting the availability of defect-free EUVL mask blanks. SEMATECH identified the key components in the ion beam deposition system that is currently impeding the reduction of defect density and the yield of EUV mask blanks. SEMATECH's current research is focused on in-house tool components to reduce their contributions to mask blank defects. SEMATECH is also working closely with the supplier to incorporate this learning into a next-generation deposition tool. This paper will describe requirements for the next-generation tool that are essential to realize low defect density EUV mask blanks. The goal of our work is to enable model-based predictions of defect performance and defect improvement for targeted process improvement and component learning to feed into the new deposition tool design. This paper will also highlight the defect reduction resulting from process improvements and the restrictions inherent in the current tool geometry and components that are an impediment to meeting HVM quality EUV mask blanks will be outlined.

  6. Extracting messages masked by chaos

    International Nuclear Information System (INIS)

    Perez, G.; Cerdeira, H.A.

    1995-01-01

    We show how to extract messages that are masked by a chaotic signal in a system of two Lorenz oscillators. This mask removal is done for two different modes of transmission, a digital one where a parameter of the sender is switched between two values, and an analog mode, where a small amplitude message is added to the carrier signal. We achieve this without using a second Lorenz oscillator as receiver, and without doing a full reconstruction of the dynamics. This method is robust with respect to transformations that impede the unmasking using a Lorenz receiver, and is not affected by the broad-band noise that is inherent to the synchronization process. We also discuss the limitations of this way of extraction for messages in high frequency bands. (author). 12 refs, 4 figs

  7. Rapid mask prototyping for microfluidics.

    Science.gov (United States)

    Maisonneuve, B G C; Honegger, T; Cordeiro, J; Lecarme, O; Thiry, T; Fuard, D; Berton, K; Picard, E; Zelsmann, M; Peyrade, D

    2016-03-01

    With the rise of microfluidics for the past decade, there has come an ever more pressing need for a low-cost and rapid prototyping technology, especially for research and education purposes. In this article, we report a rapid prototyping process of chromed masks for various microfluidic applications. The process takes place out of a clean room, uses a commercially available video-projector, and can be completed in less than half an hour. We quantify the ranges of fields of view and of resolutions accessible through this video-projection system and report the fabrication of critical microfluidic components (junctions, straight channels, and curved channels). To exemplify the process, three common devices are produced using this method: a droplet generation device, a gradient generation device, and a neuro-engineering oriented device. The neuro-engineering oriented device is a compartmentalized microfluidic chip, and therefore, required the production and the precise alignment of two different masks.

  8. Sinusoidal masks for single channel speech separation

    DEFF Research Database (Denmark)

    Mowlaee, Pejman; Christensen, Mads Græsbøll; Jensen, Søren Holdt

    2010-01-01

    In this paper we present a new approach for binary and soft masks used in single-channel speech separation. We present a novel approach called the sinusoidal mask (binary mask and Wiener filter) in a sinusoidal space. Theoretical analysis is presented for the proposed method, and we show...... that the proposed method is able to minimize the target speech distortion while suppressing the crosstalk to a predetermined threshold. It is observed that compared to the STFTbased masks, the proposed sinusoidal masks improve the separation performance in terms of objective measures (SSNR and PESQ) and are mostly...

  9. Shadows alter facial expressions of Noh masks.

    Directory of Open Access Journals (Sweden)

    Nobuyuki Kawai

    Full Text Available BACKGROUND: A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers' recognition of the emotional expressions. METHODOLOGY/PRINCIPAL FINDINGS: In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. CONCLUSIONS/SIGNIFICANCE: Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa's smile. They also agree with the aesthetic principle of Japanese traditional art "yugen (profound grace and subtlety", which highly appreciates subtle emotional expressions in the darkness.

  10. Classification and printability of EUV mask defects from SEM images

    Science.gov (United States)

    Cho, Wonil; Price, Daniel; Morgan, Paul A.; Rost, Daniel; Satake, Masaki; Tolani, Vikram L.

    2017-10-01

    Classification and Printability of EUV Mask Defects from SEM images EUV lithography is starting to show more promise for patterning some critical layers at 5nm technology node and beyond. However, there still are many key technical obstacles to overcome before bringing EUV Lithography into high volume manufacturing (HVM). One of the greatest obstacles is manufacturing defect-free masks. For pattern defect inspections in the mask-shop, cutting-edge 193nm optical inspection tools have been used so far due to lacking any e-beam mask inspection (EBMI) or EUV actinic pattern inspection (API) tools. The main issue with current 193nm inspection tools is the limited resolution for mask dimensions targeted for EUV patterning. The theoretical resolution limit for 193nm mask inspection tools is about 60nm HP on masks, which means that main feature sizes on EUV masks will be well beyond the practical resolution of 193nm inspection tools. Nevertheless, 193nm inspection tools with various illumination conditions that maximize defect sensitivity and/or main-pattern modulation are being explored for initial EUV defect detection. Due to the generally low signal-to-noise in the 193nm inspection imaging at EUV patterning dimensions, these inspections often result in hundreds and thousands of defects which then need to be accurately reviewed and dispositioned. Manually reviewing each defect is difficult due to poor resolution. In addition, the lack of a reliable aerial dispositioning system makes it very challenging to disposition for printability. In this paper, we present the use of SEM images of EUV masks for higher resolution review and disposition of defects. In this approach, most of the defects detected by the 193nm inspection tools are first imaged on a mask SEM tool. These images together with the corresponding post-OPC design clips are provided to KLA-Tencor's Reticle Decision Center (RDC) platform which provides ADC (Automated Defect Classification) and S2A (SEM

  11. [The EFS metrology: From the production to the reason].

    Science.gov (United States)

    Reifenberg, J-M; Riout, E; Leroy, A; Begue, S

    2014-06-01

    In order to answer statutory requirements and to anticipate the future needs and standards, the EFS is committed, since a few years, in a process of harmonization of its metrology function. In particular, the institution has opted for the skills development by internalizing the metrological traceability of the main critical quantities (temperature, volumetric) measurements. The development of metrology so resulted in a significant increase in calibration and testing activities. Methods are homogenized and improved through accreditations. The investment strategies are based on more and more demanding specifications. The performance of the equipments is better known and mastered. Technical expertise and maturity of the national metrology function today are assets to review in more informed ways the appropriateness of the applied periodicities. Analysis of numerous information and data in the calibration and testing reports could be pooled and operated on behalf of the unique establishment. The objective of this article is to illustrate these reflections with a few examples from of a feedback of the EFS Pyrénées Méditerranée. The analysis of some methods of qualification, the exploitation of the historical metrology in order to quantify the risk of non-compliance, and to adapt the control strategy, analysis of the criticality of an instrument in a measurement process, risk analyses are tools that deserve to be more widely exploited for that discipline wins in efficiency at the national level. Copyright © 2014 Elsevier Masson SAS. All rights reserved.

  12. Introduction to quantum metrology quantum standards and instrumentation

    CERN Document Server

    Nawrocki, Waldemar

    2015-01-01

    This book presents the theory of quantum effects used in metrology and results of the author’s own research in the field of quantum electronics. The book provides also quantum measurement standards used in many branches of metrology for electrical quantities, mass, length, time and frequency. This book represents the first comprehensive survey of quantum metrology problems. As a scientific survey, it propagates a new approach to metrology with more emphasis on its connection with physics. This is of importance for the constantly developing technologies and nanotechnologies in particular. Providing a presentation of practical applications of the effects used in quantum metrology for the construction of quantum standards and sensitive electronic components, the book is useful for a wide audience of physicists and metrologists in the broad sense of both terms. In 2014 a new system of units, the so called  Quantum SI, is introduced. This book helps to understand and approve the new system to both technology a...

  13. Laser metrology for a next generation gravimetric mission

    Science.gov (United States)

    Mottini, Sergio; Biondetti, Giorgio; Cesare, Stefano; Castorina, Giuseppe; Musso, Fabio; Pisani, Marco; Leone, Bruno

    2017-11-01

    Within the ESA technology research project "Laser Interferometer High Precision tracking for LEO", Thales Alenia Space Italia is developing a laser metrology system for a Next Generation Gravimetric Mission (NGGM) based on satellite-to-satellite tracking. This technique is based on the precise measurement of the displacement between two satellites flying in formation at low altitude for monitoring the variations of Earth's gravity field at high resolution over a long time period. The laser metrology system that has been defined for this mission consists of the following elements: • an heterodyne Michelson interferometer for measuring the distance variation between retroreflectors positioned on the two satellites; • an angle metrology for measuring the orientation of the laser beam in the reference frames of the two satellites; • a lateral displacement metrology for measuring the deviations of the laser beam axis from the target retro-reflector. The laser interferometer makes use of a chopped measurement beam to avoid spurious signals and nonlinearity caused by the unbalance between the strong local beam and the weak return beam. The main results of the design, development and test activities performed on the breadboard of the metrology system are summarized in this paper.

  14. An optimized OPC and MDP flow for reducing mask write time and mask cost

    Science.gov (United States)

    Yang, Ellyn; Li, Cheng He; Park, Se Jin; Zhu, Yu; Guo, Eric

    2010-09-01

    In the process of optical proximity correction, layout edge or fragment is migrating to proper position in order to minimize edge placement error (EPE). During this fragment migration, several factors other than EPE can be also taken into account as a part of cost function for optimal fragment displacement. Several factors are devised in favor of OPC stability, which can accommodate room for high mask error enhancement factor (MEEF), lack of process window, catastrophic pattern failure such as pinch/bridge and improper fragmentation. As technology node becomes finer, there happens conflict between OPC accuracy and stability. Especially for metal layers, OPC has focused on the stability by loss of accurate OPC results. On this purpose, several techniques have been introduced, which are target smoothing, process window aware OPC, model-based retargeting and adaptive OPC. By utilizing those techniques, OPC enables more stabilized patterning, instead of realizing design target exactly on wafer. Inevitably, post-OPC layouts become more complicated because those techniques invoke additional edge, or fragments prior to correction or during OPC iteration. As a result, jogs of post OPC layer can be dramatically increased, which results in huge number of shot count after data fracturing. In other words, there is trade-off relationship between data complexity and various methods for OPC stability. In this paper, those relationships have been investigated with respect to several technology nodes. The mask shot count reduction is achieved by reducing the number of jogs with which EPE difference are within pre-specified value. The effect of jog smoothing on OPC output - in view of OPC performance and mask data preparation - was studied quantitatively for respective technology nodes.

  15. Laser source for dimensional metrology: investigation of an iodine stabilized system based on narrow linewidth 633 nm DBR diode

    Science.gov (United States)

    Rerucha, Simon; Yacoot, Andrew; Pham, Tuan M.; Cizek, Martin; Hucl, Vaclav; Lazar, Josef; Cip, Ondrej

    2017-04-01

    We demonstrated that an iodine stabilized distributed Bragg reflector (DBR) diode based laser system lasing at a wavelength in close proximity to λ =633 nm could be used as an alternative laser source to the helium-neon lasers in both scientific and industrial metrology. This yields additional advantages besides the optical frequency stability and coherence: inherent traceability, wider optical frequency tuning range, higher output power and high frequency modulation capability. We experimentally investigated the characteristics of the laser source in two major steps: first using a wavelength meter referenced to a frequency comb controlled with a hydrogen maser and then on an interferometric optical bench testbed where we compared the performance of the laser system with that of a traditional frequency stabilized He-Ne laser. The results indicate that DBR diode laser system provides a good laser source for applications in dimensional (nano)metrology, especially in conjunction with novel interferometric detection methods exploiting high frequency modulation or multiaxis measurement systems.

  16. Dynamic Length Metrology (DLM) for measurements with sub-micrometre uncertainty in a production environment

    DEFF Research Database (Denmark)

    De Chiffre, Leonardo; Hansen, Hans Nørgaard; Hattel, Jesper Henri

    2016-01-01

    Conventional length metrology for traceable accurate measurements requires costly temperature controlled facilities, long waiting time for part acclimatisation, and separate part material characterisation. This work describes a method called Dynamic Length Metrology (DLM) developed to achieve sub...

  17. Automation of testing the metrological reliability of nondestructive control systems

    International Nuclear Information System (INIS)

    Zhukov, Yu.A.; Isakov, V.B.; Karlov, Yu.K.; Kovalevskij, Yu.A.

    1987-01-01

    Opportunities of microcomputers are used to solve the problem of testing control-measuring systems. Besides the main program the program of data processing when characterizing the nondestructive control systems is written in the microcomputer. The program includes two modules. The first module contains tests-programs, by which accuracy of functional elements of the microcomputer and interface elements with issuing a message to the operator on readiness of the elements for operation and failure of a certain element are determined. The second module includes: calculational programs when determining metrological reliability of measuring channel reliability, a calculational subprogram for random statistical measuring error, time instability and ''dead time''. Automation of testing metrological reliability of the nondestructive control systems increases reliability of determining metrological parameters and reduces time of system testing

  18. Whispering gallery mode resonators for frequency metrology applications

    Science.gov (United States)

    Baumgartel, Lukas

    This dissertation describes an investigation into the use of whispering gallery mode (WGM) resonators for applications towards frequency reference and metrology. Laser stabilization and the measurement of optical frequencies have enabled myriad technologies of both academic and commercial interest. A technology which seems to span both motivations is optical atomic clocks. These devices are virtually unimaginable without the ultra stable lasers plus frequency measurement and down-conversion afforded by Fabry Perot (FP) cavities and model-locked laser combs, respectively. However, WGM resonators can potentially perform both of these tasks while having the distinct advantages of compactness and simplicity. This work represents progress towards understanding and mitigating the performance limitations of WGM cavities for such applications. A system for laser frequency stabilization to a the cavity via the Pound-Drever-Hall (PDH) method is described. While the laser lock itself is found to perform at the level of several parts in 1015, a variety of fundamental and technical mechanisms destabilize the WGM frequency itself. Owing to the relatively large thermal expansion coefficients in optical crystals, environmental temperature drifts set the stability limit at time scales greater than the thermal relaxation time of the crystal. Uncompensated, these drifts pull WGM frequencies about 3 orders of magnitude more than they would in an FP cavity. Thus, two temperature compensation schemes are developed. An active scheme measures and stabilizes the mode volume temperature to the level of several nK, reducing the effective temperature coefficient of the resonator to 1.7x10-7 K-1; simulations suggest that the value could eventually be as low as 3.5x10-8 K-1, on par with the aforementioned FP cavities. A second, passive scheme is also described, which employs a heterogeneous resonator structure that capitalizes on the thermo-mechanical properties of one material and the optical

  19. Mask characterization for critical dimension uniformity budget breakdown in advanced extreme ultraviolet lithography

    Science.gov (United States)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2013-04-01

    As the International Technology Roadmap for Semiconductors critical dimension uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. We will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for advanced extreme ultraviolet (EUV) lithography with 1D (dense lines) and 2D (dense contacts) feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CDs and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples. Mask stack reflectivity variations should also be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We also observed mask error enhancement factor (MEEF) through field fingerprints in the studied EUV cases. Variations of MEEF may play a role towards the total intrafield CDU and may need to be taken into account for EUV lithography. We characterized MEEF-through-field for the reviewed features, with results herein, but further analysis of this phenomenon is required. This comprehensive approach to quantifying the mask part of

  20. Brightness masking is modulated by disparity structure.

    Science.gov (United States)

    Pelekanos, Vassilis; Ban, Hiroshi; Welchman, Andrew E

    2015-05-01

    The luminance contrast at the borders of a surface strongly influences surface's apparent brightness, as demonstrated by a number of classic visual illusions. Such phenomena are compatible with a propagation mechanism believed to spread contrast information from borders to the interior. This process is disrupted by masking, where the perceived brightness of a target is reduced by the brief presentation of a mask (Paradiso & Nakayama, 1991), but the exact visual stage that this happens remains unclear. In the present study, we examined whether brightness masking occurs at a monocular-, or a binocular-level of the visual hierarchy. We used backward masking, whereby a briefly presented target stimulus is disrupted by a mask coming soon afterwards, to show that brightness masking is affected by binocular stages of the visual processing. We manipulated the 3-D configurations (slant direction) of the target and mask and measured the differential disruption that masking causes on brightness estimation. We found that the masking effect was weaker when stimuli had a different slant. We suggest that brightness masking is partly mediated by mid-level neuronal mechanisms, at a stage where binocular disparity edge structure has been extracted. Copyright © 2015 The Authors. Published by Elsevier Ltd.. All rights reserved.

  1. The Act of 17 March 2000 on metrology and on changes and amendments of some acts

    International Nuclear Information System (INIS)

    2000-01-01

    This act metrology for organization of unity and correctness of mensuration adapts (a) the law measurement units, (b) the requests on committed gauges and their metrological control, (c) the conditions of official mensuration, (d) the requests on consumptive packages articles; (e) the conditions of authorization and registration, (f) operation of organs of the state administration for metrology, (g) the metrological authority (h) putting of fines. This act shall into effect on 1 July 2000

  2. Metrology and analytical chemistry: Bridging the cultural gap

    International Nuclear Information System (INIS)

    King, Bernard

    2002-01-01

    Metrology in general and issues such as traceability and measurement uncertainty in particular are new to most analytical chemists and many remain to be convinced of their value. There is a danger of the cultural gap between metrologists and analytical chemists widening with unhelpful consequences and it is important that greater collaboration and cross-fertilisation is encouraged. This paper discusses some of the similarities and differences in the approaches adopted by metrologists and analytical chemists and indicates how these approaches can be combined to establish a unique metrology of chemical measurement which could be accepted by both cultures. (author)

  3. Mycotoxin metrology: Gravimetric production of zearalenone calibration solution

    Science.gov (United States)

    Rego, E. C. P.; Simon, M. E.; Li, Xiuqin; Li, Xiaomin; Daireaux, A.; Choteau, T.; Westwood, S.; Josephs, R. D.; Wielgosz, R. I.; Cunha, V. S.

    2018-03-01

    Food safety is a major concern for countries developing metrology and quality assurance systems, including the contamination of food and feed by mycotoxins. To improve the mycotoxin analysis and ensure the metrological traceability, CRM of calibration solution should be used. The production of certified mycotoxin solutions is a major challenge due to the limited amount of standard for conducting a proper purity study and due to the cost of standards. The CBKT project was started at BIPM and Inmetro produced gravimetrically one batch of zearelenone in acetronitrile (14.708 ± 0.016 μg/g, k=2) and conducted homogeneity, stability and value assignment studies.

  4. Metrology in CNEN NN 3.05/13 standard

    International Nuclear Information System (INIS)

    Mello, Marina Santiago de

    2014-01-01

    The nuclear medicine exams are widely used tools in health services for a reliable clinical and functional diagnosis of a disease. In Brazil, the National Nuclear Energy Commission, through the norm CNEN-NN 3:05/13, provides for the requirements of safety and radiological protection in nuclear medicine services. The objective of this review article was to emphasize the importance of metrology in compliance with this norm. We observed that metrology plays a vital role as it ensures the quality, accuracy, reproducibility and consistency of the measurements in the field of nuclear medicine. (author)

  5. Improved capacity in ionizing radiation metrology at SANAEM

    International Nuclear Information System (INIS)

    Yucel, U.

    2014-01-01

    Full text : Turkey is planning to build nuclear power plants in the south and north coasts to supply the ever-increasing energy demand. The nuclear power plants based on old soviet technology in Armenia and Bulgaria close to Turkey's borders also makes constant monitoring of environmental radioactivity extremely important due to public health and environment contamination concerns. Radiation Metrology Division at SANAEM has been established in 2012 to provide uniformity and reliability of the measurements in the field of ionizing radiation metrology by R and D studies and by constituting, developing, keeping and extending internationally accepted reference measurement standards and techniques

  6. Dark matter: a problem in relativistic metrology?

    International Nuclear Information System (INIS)

    Lusanna, Luca

    2017-01-01

    Besides the tidal degrees of freedom of Einstein general relativity (GR) (namely the two polarizations of gravitational waves after linearization of the theory) there are the inertial gauge ones connected with the freedom in the choice of the 4-coordinates of the space-time, i.e. in the choice of the notions of time and 3-space (the 3+1 splitting of space-time) and in their use to define a non-inertial frame (the inertial ones being forbidden by the equivalence principle) by means of a set of conventions for the relativistic metrology of the space-time (like the GPS ones near the Earth). The canonical York basis of canonical ADM gravity allows us to identify the Hamiltonian inertial gauge variables in globally hyperbolic asymptotically Minkowskian space-times without super-translations and to define the family of non-harmonic Schwinger time gauges. In these 3+1 splittings of space-time the freedom in the choice of time (the problem of clock synchronization) is described by the inertial gauge variable York time (the trace of the extrinsic curvature of the instantaneous 3-spaces). This inertial gauge freedom and the non-Euclidean nature of the instantaneous 3-spaces required by the equivalence principle need to be incorporated as metrical conventions in a relativistic suitable extension of the existing (essentially Galilean) ICRS celestial reference system. In this paper I make a short review of the existing possibilities to explain the presence of dark matter (or at least of part of it) as a relativistic inertial effect induced by the non- Euclidean nature of the 3-spaces. After a Hamiltonian Post-Minkowskian (HPM) linearization of canonical ADM tetrad gravity with particles, having equal inertial and gravitational masses, as matter, followed by a Post-Newtonian (PN) expansion, we find that the Newtonian equality of inertial and gravitational masses breaks down and that the inertial gauge York time produces an increment of the inertial masses explaining at least

  7. Actinic Mask Inspection at the ALS Initial Design Review

    International Nuclear Information System (INIS)

    Barty, A; Chapman, H; Sweeney, D; Levesque, R; Bokor, J; Gullikson, E; Jong, S; Liu, Y; Yi, M; Denbeaux, G; Goldberg, K; Naulleau, P; Denham, P; Rekawa, S; Baston, P; Tackaberry, R; Barale, P

    2003-01-01

    configured so that the collected data emulates the aerial image of a stepper system, thereby enabling rapid evaluation of mask defects and patterning without the need for a resist exposure step. The main uses of the microscope in this mode would be: (a) Review of multilayer and pattern defects to determine their printability; (b) Defect review following a repair process to assess the success of the operation; (c) Investigation of the effects of illumination and NA on the printed image; (d) Process window analysis of defects and other mask features; and (e) Characterizing defects on both patterned and unpatterned masks (i.e. blanks). An essential characteristic of operation in this mode is that the illumination and imaging conditions through focus should emulate as accurately as possible that of a production stepper system. This mode is designed for local review of defects over a small sub-field of the mask; therefore it is not necessary to have the same high-speed throughput required for defect inspection mode. We first describe some technical background relating to EUV masks and defect scanning, with the aim of defining the context of the tool and experiments to be performed. We then present an overview of several candidate optical system configurations for achieve the above objectives, and analyze the ability of each system to achieve the stated project goals. Of key importance is throughput and sensitivity in inspection mode, whilst in AIM mode key points are spatial resolution and the ability to perform stepper emulation imaging. We then down-select the best candidate from this set of solutions to one system, which is then investigated in further detail with a view to producing a preliminary tool design and estimates of overall system performance

  8. Metrology and quality assurance for European XFEL long flat mirrors installation

    Science.gov (United States)

    Freijo Martín, Idoia; Vannoni, Maurizio; Sinn, Harald

    2017-06-01

    The European XFEL is a large-scale user facility under construction in Hamburg, Germany. It will provide a transversally fully coherent X-ray radiation with outstanding characteristics: high repetition rate (up to 2700 pulses with a 0.6 milliseconds long pulse train at 10Hz), short wavelength (down to 0.05 nm), short pulses (in the femtoseconds scale) and high average brilliance (1.6x1025 photons / s / mm2 / mrad2/ 0.1% bandwidth)1. Due to the short wavelength and high pulse energies, mirrors need to have a high-quality surface, have to be very long (1 m), and at the same time an effective cooling system has to be implemented. Matching these tight specifications and assessing them with high precision optical measurements is very challenging. The mirrors go through a complicated and long process, starting from classical polishing to deterministic polishing, ending with a special coating and a final metrology assessment inside their mechanical mounts just before the installation. The installation itself is also difficult for such big mirrors and needs special care. In this contribution we will explain how we implemented the installation process, how we used the metrology information to optimize the installation procedure and we will show some preliminary results with the first mirrors installed in the European XFEL beam transport.

  9. Development of an ultrasensitive interferometry system as a key to precision metrology applications

    Science.gov (United States)

    Gohlke, Martin; Schuldt, Thilo; Weise, Dennis; Johann, Ulrich; Peters, Achim; Braxmaier, Claus

    2009-06-01

    We present a symmetric heterodyne interferometer as a prototype of a highly sensitive translation and tilt measurement system. This compact optical metrology system was developed over the past several years by EADS Astrium (Friedrichshafen) in cooperation with the Humboldt-University (Berlin) and the university of applied science Konstanz (HTWG-Konstanz). The noise performance was tested at frequencies between 10-4 and 3 Hz, the noise levels are below 1 nm/Hz 1/2 for translation and below 1 μrad/Hz1/2, for tilt measurements. For frequencies higher than 10 mHz noise levels below 5pm/Hz1/2 and 4 nrad/Hz1/2 respectively, were demonstrated. Based on this highly sensitive metrology system we also developed a dilatometer for the characterization of the CTE (coefficient of thermal expansion) of various materials, i.e. CFRP (carbon fiber reinforced plastic) or Zerodur. The currently achieved sensitivity of these measurements is better than 10-7 K-1. Future planned applications of the interferometer include ultra-high-precision surface profiling and characterization of actuator noise in low-noise opto-mechanics setups. We will give an overview of the current experimental setup and the latest measurement results.

  10. Bell Inequality, Einstein-Podolsky-Rosen Steering, and Quantum Metrology with Spinor Bose-Einstein Condensates

    Science.gov (United States)

    Wasak, Tomasz; Chwedeńczuk, Jan

    2018-04-01

    We propose an experiment, where the Bell inequality is violated in a many-body system of massive particles. The source of correlated atoms is a spinor F =1 Bose-Einstein condensate residing in an optical lattice. We characterize the complete procedure—the local operations, the measurements, and the inequality—necessary to run the Bell test. We show how the degree of violation of the Bell inequality depends on the strengths of the two-body correlations and on the number of scattered pairs. We show that the system can be used to demonstrate the Einstein-Podolsky-Rosen paradox. Also, the scattered pairs are an excellent many-body resource for the quantum-enhanced metrology. Our results apply to any multimode system where the spin-changing collision drives the scattering into separate regions. The presented inquiry shows that such a system is versatile as it can be used for the tests of nonlocality, quantum metrology, and quantum information.

  11. Unconditional violation of the shot-noise limit in photonic quantum metrology

    Science.gov (United States)

    Slussarenko, Sergei; Weston, Morgan M.; Chrzanowski, Helen M.; Shalm, Lynden K.; Verma, Varun B.; Nam, Sae Woo; Pryde, Geoff J.

    2017-11-01

    Interferometric phase measurement is widely used to precisely determine quantities such as length, speed and material properties1-3. Without quantum correlations, the best phase sensitivity Δ ϕ achievable using n photons is the shot-noise limit, Δ ϕ =1 /√{n }. Quantum-enhanced metrology promises better sensitivity, but, despite theoretical proposals stretching back decades3,4, no measurement using photonic (that is, definite photon number) quantum states has truly surpassed the shot-noise limit. Instead, all such demonstrations, by discounting photon loss, detector inefficiency or other imperfections, have considered only a subset of the photons used. Here, we use an ultrahigh-efficiency photon source and detectors to perform unconditional entanglement-enhanced photonic interferometry. Sampling a birefringent phase shift, we demonstrate precision beyond the shot-noise limit without artificially correcting our results for loss and imperfections. Our results enable quantum-enhanced phase measurements at low photon flux and open the door to the next generation of optical quantum metrology advances.

  12. Complex metrology on 3D structures using multi-channel OCD

    Science.gov (United States)

    Kagalwala, Taher; Mahendrakar, Sridhar; Vaid, Alok; Isbester, Paul K.; Cepler, Aron; Kang, Charles; Yellai, Naren; Sendelbach, Matthew; Ko, Mihael; Ilgayev, Ovadia; Katz, Yinon; Tamam, Lilach; Osherov, Ilya

    2017-03-01

    Device scaling has not only driven the use of measurements on more complex structures, in terms of geometry, materials, and tighter ground rules, but also the need to move away from non-patterned measurement sites to patterned ones. This is especially of concern for very thin film layers that have a high thickness dependence on structure geometry or wafer pattern factor. Although 2-dimensional (2D) sites are often found to be sufficient for process monitoring and control of very thin films, sometimes 3D sites are required to further simulate structures within the device. The measurement of film thicknesses only a few atoms thick on complex 3D sites, however, are very challenging. Apart from measuring thin films on 3D sites, there is also a critical need to measure parameters on 3D sites, which are weak and less sensitive for OCD (Optical Critical Dimension) metrology, with high accuracy and precision. Thus, state-ofthe-art methods are needed to address such metrology challenges. This work introduces the concept of Enhanced OCD which uses various methods to improve the sensitivity and reduce correlations for weak parameters in a complex measurement. This work also describes how more channels of information, when used correctly, can improve the precision and accuracy of weak, non-sensitive or complex parameters of interest.

  13. Bell Inequality, Einstein-Podolsky-Rosen Steering, and Quantum Metrology with Spinor Bose-Einstein Condensates.

    Science.gov (United States)

    Wasak, Tomasz; Chwedeńczuk, Jan

    2018-04-06

    We propose an experiment, where the Bell inequality is violated in a many-body system of massive particles. The source of correlated atoms is a spinor F=1 Bose-Einstein condensate residing in an optical lattice. We characterize the complete procedure-the local operations, the measurements, and the inequality-necessary to run the Bell test. We show how the degree of violation of the Bell inequality depends on the strengths of the two-body correlations and on the number of scattered pairs. We show that the system can be used to demonstrate the Einstein-Podolsky-Rosen paradox. Also, the scattered pairs are an excellent many-body resource for the quantum-enhanced metrology. Our results apply to any multimode system where the spin-changing collision drives the scattering into separate regions. The presented inquiry shows that such a system is versatile as it can be used for the tests of nonlocality, quantum metrology, and quantum information.

  14. Scatterometry measurement of nested lines, dual space, and rectangular contact CD on phase-shift masks

    Science.gov (United States)

    Lee, Kyung M.; Yedur, Sanjay; Henrichs, Sven; Tavassoli, Malahat; Baik, Kiho

    2007-03-01

    Evaluation of lithography process or stepper involves very large quantity of CD measurements and measurement time. In this paper, we report on a application of Scatterometry based metrology for evaluation of binary photomask lithography. Measurements were made on mask level with ODP scatterometer then on wafer with CD-SEM. 4 to 1 scaling from mask to wafer means 60nm line on wafer translates to 240nm on mask, easily measurable on ODP. Calculation of scatterometer profile information was performed by a in-situ library-based analysis (5sec/site). We characterized the CD uniformity, linearity, and metal film thickness uniformity. Results show that linearity measured from fixed-pitch, varying line/space ratio targets show good correlation to top-down CD-SEM with R2 of more than 0.99. ODP-SEM correlation results for variable pitch shows that careful examination of scatterometer profile results in order to obtain better correlation to CD SEM, since both tools react differently to the target profile variation. ODP results show that global CD distribution is clearly measurable with less outliers compared to CD SEM data. This is thought to be due to 'averaging' effect of scatterometer. The data show that Scatterometry provides a nondestructive and faster mean of characterizing lithography stepper performanceprofiles. APSM 1st level (before Cr removal) 'dual-space' CDs and EPSM rectangular contacts were also measured with and results demonstrates that Scatterometer is capable of measuring these targets with reasonable correlation to SEM.

  15. The JWST/NIRCam Coronagraph: Mask Design and Fabrication

    Science.gov (United States)

    Krista, John E.; Balasubramanian, Kunjithapatha; Beichman, Charles A.; Echternach, Pierre M.; Green, Joseph J.; Liewer, Kurt M.; Muller, Richard E.; Serabyn, Eugene; Shaklan, Stuart B.; Trauger, John T.; hide

    2009-01-01

    The NIRCam instrument on the James Webb Space Telescope will provide coronagraphic imaging from lambda =1-5 microns of high contrast sources such as extrasolar planets and circumstellar disks. A Lyot coronagraph with a variety of circular and wedge-shaped occulting masks and matching Lyot pupil stops will be implemented. The occulters approximate grayscale transmission profiles using halftone binary patterns comprising wavelength-sized metal dots on anti-reflection coated sapphire substrates. The mask patterns are being created in the Micro Devices Laboratory at the Jet Propulsion Laboratory using electron beam lithography. Samples of these occulters have been successfully evaluated in a coronagraphic testbed. In a separate process, the complex apertures that form the Lyot stops will be deposited onto optical wedges. The NIRCam coronagraph flight components are expected to be completed this year.

  16. Ray-tracing of shape metrology data of grazing incidence x-ray astronomy mirrors

    Science.gov (United States)

    Zocchi, Fabio E.; Vernani, Dervis

    2008-07-01

    A number of future X-ray astronomy missions (e.g. Simbol-X, eROSITA) plan to utilize high throughput grazing incidence optics with very lightweight mirrors. The severe mass specifications require a further optimization of the existing technology with the consequent need of proper optical numerical modeling capabilities for both the masters and the mirrors. A ray tracing code has been developed for the simulation of the optical performance of type I Wolter masters and mirrors starting from 2D and 3D metrology data. In particular, in the case of 2D measurements, a 3D data set is reconstructed on the basis of dimensional references and used for the optical analysis by ray tracing. In this approach, the actual 3D shape is used for the optical analysis, thus avoiding the need of combining the separate contributions of different 2D measurements that require the knowledge of their interactions which is not normally available. The paper describes the proposed approach and presents examples of application on a prototype engineering master in the frame of ongoing activities carried out for present and future X-ray missions.

  17. Means to verify the accuracy of CT systems for metrology applications (In the Absence of Established International Standards)

    International Nuclear Information System (INIS)

    Lettenbauer, H.; Georgi, B.; Weib, D.

    2007-01-01

    X-ray computed tomography (CT) reconstructs an unknown object from X-ray projections and has long been used for qualitative investigation of internal structures in industrial applications. Recently there has been increased interest in applying X-ray cone beam CT to the task of high-precision dimensional measurements of machined parts, since it is a relatively fast method of measuring both inner and outer geometries of arbitrary complexity. The important information for the user in dimensional metrology is if measured elements of a machined part are within the defined tolerances or not. In order to qualify cone beam CT as an established measurement technology, it must be qualified in the same manner as established measurement technologies such as coordinate measurement machines (CMMs) with tactile or optical sensors. In international standards artefacts are defined that are calibrated by certified institutions. These artefacts are defined by certain geometrical elements. CT measurements are performed on the reconstructed object volume, either directly or using an intermediate surface-extraction step. The results of these measurements have to be compared to the values of the calibrated elements; the level of agreement of the results defines the accuracy of the measurements. By using established methods to define measurement uncertainty a very high level of acceptance in dimensional metrology can be reached for the user. Only if results are comparable to standards of the established technologies the barriers of entry into metrology will be removed and all benefits of this technology will be available for the user. (authors)

  18. A Masked Photocathode in a Photoinjector

    OpenAIRE

    Qiang, Ji

    2011-01-01

    In this paper, we propose a masked photocathode inside a photoinjector for generating high brightness electron beam. Instead of mounting the photocathode onto an electrode, an electrode with small hole is used as a mask to shield the photocathode from the accelerating vacuum chamber. Using such a masked photocathode will make the replacement of photocathode material easy by rotating the photocathode behind the electrode into the hole. Furthermore, this helps reduce the dark current or seconda...

  19. Formation of multiple focal spots using a high NA lens with a complex spiral phase mask

    Science.gov (United States)

    Lalithambigai, K.; Anbarasan, P. M.; Rajesh, K. B.

    2014-07-01

    The formation of a transversally polarized beam by transmitting a tightly focused double-ring-shaped azimuthally polarized beam through a complex spiral phase mask and high numerical aperture lens is presented based on vector diffraction theory. The generation of transversally polarized focal spot segment splitting and multiple focal spots is illustrated numerically. Moreover, we found that a properly designed complex spiral phase mask can move the focal spots along the optical axis in the z direction. Therefore, one can achieve a focal segment of two, three or multiple completely transversely polarized focal spots, which finds applications in optical trapping and in material processing technologies.

  20. Predicting masking release of lateralized speech

    DEFF Research Database (Denmark)

    Chabot-Leclerc, Alexandre; MacDonald, Ewen; Dau, Torsten

    2016-01-01

    . The largest masking release (MR) was observed when all maskers were on the opposite side of the target. The data in the conditions containing only energetic masking and modulation masking could be accounted for using a binaural extension of the speech-based envelope power spectrum model [sEPSM; Jørgensen et...... al., 2013, J. Acoust. Soc. Am. 130], which uses a short-term equalization-cancellation process to model binaural unmasking. In the conditions where informational masking (IM) was involved, the predicted SRTs were lower than the measured values because the model is blind to confusions experienced...

  1. High-charge and multiple-star vortex coronagraphy from stacked vector vortex phase masks.

    Science.gov (United States)

    Aleksanyan, Artur; Brasselet, Etienne

    2018-02-01

    Optical vortex phase masks are now installed at many ground-based large telescopes for high-contrast astronomical imaging. To date, such instrumental advances have been restricted to the use of helical phase masks of the lowest even order, while future giant telescopes will require high-order masks. Here we propose a single-stage on-axis scheme to create high-order vortex coronagraphs based on second-order vortex phase masks. By extending our approach to an off-axis design, we also explore the implementation of multiple-star vortex coronagraphy. An experimental laboratory demonstration is reported and supported by numerical simulations. These results offer a practical roadmap to the development of future coronagraphic tools with enhanced performances.

  2. APPLICATION OF VORONOI DIAGRAM TO MASK-BASED INTERCEPTING PHASE-SPACE MEASUREMENTS

    Energy Technology Data Exchange (ETDEWEB)

    Halavanau, A. [Fermilab; Ha, G. [POSTECH

    2017-05-19

    Intercepting multi-aperture masks (e.g. pepper pot or multislit mask) combined with a downstream transversedensity diagnostics (e.g. based on optical transition radiation or employing scintillating media) are commonly used for characterizing the phase space of charged particle beams and the associated emittances. The required data analysis relies on precise calculation of the RMS sizes and positions of the beamlets originated from the mask which drifted up to the analyzing diagnostics. Voronoi diagram is an efficient method for splitting a plane into subsets according to the distances between given vortices. The application of the method to analyze data from pepper pot and multislit mask based measurement is validated via numerical simulation and applied to experimental data acquired at the Argonne Wakefield Accelerator (AWA) facility. We also discuss the application of the Voronoi diagrams to quantify transverselymodulated beams distortion.

  3. X-diffraction technique applied for nano system metrology

    International Nuclear Information System (INIS)

    Kuznetsov, Alexei Yu.; Machado, Rogerio; Robertis, Eveline de; Campos, Andrea P.C.; Archanjo, Braulio S.; Gomes, Lincoln S.; Achete, Carlos A.

    2009-01-01

    The application of nano materials are fast growing in all industrial sectors, with a strong necessity in nano metrology and normalizing in the nano material area. The great potential of the X-ray diffraction technique in this field is illustrated at the example of metals, metal oxides and pharmaceuticals

  4. Mirror surface metrology and polishing for AXAF/TMA

    International Nuclear Information System (INIS)

    Slomba, A.; Babish, R.; Glenn, P.

    1985-01-01

    The achievement of the derived goals for mirror surface quality on the Advanced X-ray Astrophysics Facility (AXAF), Technology Mirror Assembly (TMA) required a combination of state-of-the-art metrology and polishing techniques. In this paper, the authors summarize the derived goals and cover the main facets of the various metrology instruments employed, as well as the philosophy and technique used in the polishing work. In addition, they show how progress was measured against the goals, using the detailed error budget for surface errors and a mathematical model for performance prediction. The metrology instruments represented a considerable advance on the state-of-the-art and fully satisfied the error budget goals for the various surface errors. They were capable of measuring the surface errors over a large range of spatial periods, from low-frequency figure errors to microroughness. The polishing was accomplished with a computer-controlled process, guided by the combined data from various metrology instruments. This process was also tailored to reduce the surface errors over the full range of spatial periods

  5. Information system planning work on maintenance metrological equipment

    Directory of Open Access Journals (Sweden)

    Dmitry V. Shtoller

    2011-05-01

    Full Text Available Computerization has entered into all human activities. Important role in the work now is a workstation, which increases productivity. Did not remain without attention and work of the metrological services of enterprises. Electronic records can help solve many problems for the organization of data.

  6. Accuracy and Metrological Reliability Enhancing of Thermoelectric Transducers

    Directory of Open Access Journals (Sweden)

    Bogdan Stadnyk

    2010-12-01

    Full Text Available This article is devoted to development and use of thermoelectric thermotransducers with an enhanced accuracy and metrological reliability. The actuality of a problem is stipulated. Investigating changes at typical external environments, the mechanisms of transformation function instability are considered; possibilities of thermodynamic presentation use are analyzed concerning a thermometric substance. The algorithm of thermotransducer instrumental errors’ minimization is developed.

  7. 64nm pitch metal1 double patterning metrology: CD and OVL control by SEMCD, image based overlay and diffraction based overlay

    Science.gov (United States)

    Ducoté, Julien; Dettoni, Florent; Bouyssou, Régis; Le-Gratiet, Bertrand; Carau, Damien; Dezauzier, Christophe

    2015-03-01

    Patterning process control of advanced nodes has required major changes over the last few years. Process control needs of critical patterning levels since 28nm technology node is extremely aggressive showing that metrology accuracy/sensitivity must be finely tuned. The introduction of pitch splitting (Litho-Etch-Litho-Etch) at 14FDSOInm node requires the development of specific metrologies to adopt advanced process control (for CD, overlay and focus corrections). The pitch splitting process leads to final line CD uniformities that are a combination of the CD uniformities of the two exposures, while the space CD uniformities are depending on both CD and OVL variability. In this paper, investigations of CD and OVL process control of 64nm minimum pitch at Metal1 level of 14FDSOI technology, within the double patterning process flow (Litho, hard mask etch, line etch) are presented. Various measurements with SEMCD tools (Hitachi), and overlay tools (KT for Image Based Overlay - IBO, and ASML for Diffraction Based Overlay - DBO) are compared. Metrology targets are embedded within a block instanced several times within the field to perform intra-field process variations characterizations. Specific SEMCD targets were designed for independent measurement of both line CD (A and B) and space CD (A to B and B to A) for each exposure within a single measurement during the DP flow. Based on those measurements correlation between overlay determined with SEMCD and with standard overlay tools can be evaluated. Such correlation at different steps through the DP flow is investigated regarding the metrology type. Process correction models are evaluated with respect to the measurement type and the intra-field sampling.

  8. Control and metrology of high harmonic generation on plasma mirrors

    International Nuclear Information System (INIS)

    Monchoce, Sylvain

    2014-01-01

    When an ultra intense femtosecond laser with high contrast is focused on a solid target, the laser field at focus is sufficient enough to completely ionize the target surface during the rising edge of the laser pulse and form a plasma. This dense plasma entirely reflects the incident beam in the specular direction: this is a so-called plasma mirror. As the interaction between the laser and the plasma mirror is highly non-linear, it thus leads to the high harmonic generation (HHG) in the reflected beam. In the temporal domain, this harmonic spectrum is associated to a train of atto-second pulses. The aim of my PhD were to experimentally control this HHG and to measure the properties of the harmonics. We first studied the optimization of the harmonic signal, and then the spatial characterization of the harmonic beam in the far-field (harmonic divergence). These characterizations are not only important to develop an intense XUV/atto-second light source, but also to get a better understanding of the laser-matter interaction at very high intensity. We have thus been able to get crucial information of the electrons and ions dynamics of the plasma, showing that the harmonics can also be used as a diagnostic of the laser-plasma interaction. We then developed a new general approach for optically-controlled spatial structuring of overdense plasmas generated at the surface of initially plain solid targets. We demonstrate it experimentally by creating sinusoidal plasma gratings of adjustable spatial periodicity and depth, and study the interaction of these transient structures with an ultra-intense laser pulse to establish their usability at relativistically high intensities. We then show how these gratings can be used as a 'spatial ruler' to determine the source size of the high-order harmonic beams produced at the surface of an overdense plasma. These results open new directions both for the metrology of laser-plasma interactions and the emerging field of ultrahigh

  9. 7/5nm logic manufacturing capabilities and requirements of metrology

    Science.gov (United States)

    Bunday, Benjamin; Bello, A. F.; Solecky, Eric; Vaid, Alok

    2018-03-01

    This paper will provide an update to previous works [2][4][9] to our view of the future for in-line high volume manufacturing (HVM) metrology for the semiconductor industry, concentrating on logic technology for foundries. First, we will review of the needs of patterned defect, critical dimensional (CD/3D), overlay and films metrology, and present the extensive list of applications for which metrology solutions are needed. We will then update the industry's progress towards addressing gating technical limits of the most important of these metrology solutions, highlighting key metrology technology gaps requiring industry attention and investment.

  10. Advanced fabrication of optical materials

    International Nuclear Information System (INIS)

    Hed, P.P.; Blaedel, K.L.

    1986-01-01

    The fabrication of high-precision optical elements for new generations of high-power lasers requires a deterministic method of generating precision optical surfaces entailing considerably less time, skill, and money than present optical techniques. Such a process would use precision computer-controlled machinery with ongoing in situ metrology to generate precise optical surfaces. The implementation of deterministic processes requires a better understanding of the glass-grinding process, especially the control of ductile material removal. This project is intended to develop the basic knowledge needed to implement a computer-controlled optics-manufacturing methodology

  11. Set Size and Mask Duration Do Not Interact in Object-Substitution Masking

    Science.gov (United States)

    Argyropoulos, Ioannis; Gellatly, Angus; Pilling, Michael; Carter, Wakefield

    2013-01-01

    Object-substitution masking (OSM) occurs when a mask, such as four dots that surround a brief target item, onsets simultaneously with the target and offsets a short time after the target, rather than simultaneously with it. OSM is a reduction in accuracy of reporting the target with the temporally trailing mask, compared with the simultaneously…

  12. Stress engineering in GaN structures grown on Si(111) substrates by SiN masking layer application

    Energy Technology Data Exchange (ETDEWEB)

    Szymański, Tomasz, E-mail: tomasz.szymanski@pwr.edu.pl; Wośko, Mateusz; Paszkiewicz, Bogdan; Paszkiewicz, Regina [The Faculty of Microsystem Electronics and Photonics, Wrocaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw (Poland); Drzik, Milan [International Laser Center, Ilkovicova 3, 841-04 Bratislava 4 (Slovakia)

    2015-07-15

    GaN layers without and with an in-situ SiN mask were grown by using metal organic vapor phase epitaxy for three different approaches used in GaN on silicon(111) growth, and the physical and optical properties of the GaN layers were studied. For each approach applied, GaN layers of 1.4 μm total thickness were grown, using silan SiH{sub 4} as Si source in order to grow Si{sub x}N{sub x} masking layer. The optical micrographs, scanning electron microscope images, and atomic force microscope images of the grown samples revealed cracks for samples without SiN mask, and micropits, which were characteristic for the samples grown with SiN mask. In situ reflectance signal traces were studied showing a decrease of layer coalescence time and higher degree of 3D growth mode for samples with SiN masking layer. Stress measurements were conducted by two methods—by recording micro-Raman spectra and ex-situ curvature radius measurement—additionally PLs spectra were obtained revealing blueshift of PL peak positions with increasing stress. The authors have shown that a SiN mask significantly improves physical and optical properties of GaN multilayer systems reducing stress in comparison to samples grown applying the same approaches but without SiN masking layer.

  13. Assessment of molecular contamination in mask pod

    Science.gov (United States)

    Foray, Jean Marie; Dejaune, Patrice; Sergent, Pierre; Gough, Stuart; Cheung, D.; Davenet, Magali; Favre, Arnaud; Rude, C.; Trautmann, T.; Tissier, Michel; Fontaine, H.; Veillerot, M.; Avary, K.; Hollein, I.; Lerit, R.

    2008-04-01

    Context/ study Motivation: Contamination and especially Airbone Molecular Contamination (AMC) is a critical issue for mask material flow with a severe and fairly unpredictable risk of induced contamination and damages especially for 193 nm lithography. It is therefore essential to measure, to understand and then try to reduce AMC in mask environment. Mask material flow was studied in a global approach by a pool of European partners, especially within the frame of European MEDEA+ project, so called "MUSCLE". This paper deals with results and assessment of mask pod environment in term of molecular contamination in a first step, then in a second step preliminary studies to reduce mask pod influence and contamination due to material out gassing. Approach and techniques: A specific assessment of environmental / molecular contamination along the supply chain was performed by all partners. After previous work presented at EMLC 07, further studies were performed on real time contamination measurement pod at different sites locations (including Mask manufacturing site, blank manufacturing sites, IC fab). Studies were linked to the main critical issues: cleaning, storage, handling, materials and processes. Contamination measurement campaigns were carried out along the mask supply chain using specific Adixen analyzer in order to monitor in real time organic contaminants (ppb level) in mask pods. Key results would be presented: VOC, AMC and humidity level on different kinds of mask carriers, impact of basic cleaning on pod outgassing measurement (VOC, NH3), and process influence on pod contamination... In a second step, preliminary specific pod conditioning studies for better pod environment were performed based on Adixen vacuum process. Process influence had been experimentally measured in term of molecular outgassing from mask pods. Different AMC experimental characterization methods had been carried out leading to results on a wide range of organic and inorganic

  14. Shadows Alter Facial Expressions of Noh Masks

    Science.gov (United States)

    Kawai, Nobuyuki; Miyata, Hiromitsu; Nishimura, Ritsuko; Okanoya, Kazuo

    2013-01-01

    Background A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers’ recognition of the emotional expressions. Methodology/Principal Findings In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. Conclusions/Significance Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa’s smile. They also agree with the aesthetic principle of Japanese traditional art “yugen (profound grace and subtlety)”, which highly appreciates subtle emotional expressions in the darkness. PMID:23940748

  15. A metrology system for a high resolution cavity beam position monitor system

    Energy Technology Data Exchange (ETDEWEB)

    Walston, Sean, E-mail: walston2@llnl.gov [Lawrence Livermore National Laboratory, 7000 East Ave., L-181, Livermore, CA 94550 (United States); Boogert, Stewart [Royal Holloway, University of London, Egham (United Kingdom); Chung, Carl; Fitsos, Pete [Lawrence Livermore National Laboratory, 7000 East Ave., L-181, Livermore, CA 94550 (United States); Frisch, Joe [Stanford Linear Accelerator Center, Menlo Park, CA (United States); Gronberg, Jeff [Lawrence Livermore National Laboratory, 7000 East Ave., L-181, Livermore, CA 94550 (United States); Hayano, Hitoshi [High Energy Accelerator Research Organization (KEK), Tsukuba-shi, Ibaraki-ken (Japan); Hinton, Shantell [Stanford Linear Accelerator Center, Menlo Park, CA (United States); Honda, Yosuke [High Energy Accelerator Research Organization (KEK), Tsukuba-shi, Ibaraki-ken (Japan); Khainovski, Oleg; Kolomensky, Yury; Loscutoff, Peter [University of California and Lawrence Berkeley National Laboratory, Berkeley, CA (United States); Lyapin, Alexey; Malton, Stephen [University College London, London (United Kingdom); May, Justin; McCormick, Douglas [Stanford Linear Accelerator Center, Menlo Park, CA (United States); Meller, Robert [Cornell University, Ithaca, NY (United States); Miller, David [University College London, London (United Kingdom); Orimoto, Toyoko [University of California and Lawrence Berkeley National Laboratory, Berkeley, CA (United States); California Institute of Technology, Pasadena, CA (United States); Ross, Marc [Stanford Linear Accelerator Center, Menlo Park, CA (United States); Fermi National Accelerator Laboratory, Batavia, IL (United States); and others

    2013-11-11

    International Linear Collider (ILC) interaction region beam sizes and component position stability requirements will likely be as small as a few nanometers. It is important to the ILC design effort to demonstrate that these tolerances can be achieved–ideally using a beam-based stability measurement. We developed a high resolution RF cavity Beam Position Monitor (BPM) system. A triplet of these BPMs, installed in the extraction line of the KEK Accelerator Test Facility (ATF) and tested with its ultra-low emittance beam, achieved a position measurement resolution of 15 nm. A metrology system for the three BPMs was subsequently installed. This system employed optical encoders to measure each BPM's position and orientation relative to a zero-coefficient of thermal expansion carbon fiber frame. We have demonstrated that the three BPMs behave as a rigid-body at the level of less than 5 nm.

  16. Metrology and Alignment of Light Weight Grazing Incidence X-Ray Mirrors

    Science.gov (United States)

    Zhang, William; Content, David; Petre, Robert; Saha, Timo

    2000-01-01

    Metrology and alignment of light weight X-ray optics have been a challenge for two reasons: (1) that the intrinsic mirror quality and distortions caused by handling can not be easily separated, and (2) the diffraction limits of the visible light become a severe problem at the order of one arc-minute. Traditional methods of using a normal incident pencil or small parallel beam which monitors a tiny fraction of the mirror in question at a given time can not adequately monitor those distortions. We are developing a normal incidence setup that monitors a large fraction, if not the whole, of the mirror at any given time. It will allow us to align thin X-ray mirrors to-an accuracy of a few arc seconds or to a limit dominated by the mirror intrinsic quality.

  17. Detecting metrologically useful asymmetry and entanglement by a few local measurements

    Science.gov (United States)

    Zhang, Chao; Yadin, Benjamin; Hou, Zhi-Bo; Cao, Huan; Liu, Bi-Heng; Huang, Yun-Feng; Maity, Reevu; Vedral, Vlatko; Li, Chuan-Feng; Guo, Guang-Can; Girolami, Davide

    2017-10-01

    Important properties of a quantum system are not directly measurable, but they can be disclosed by how fast the system changes under controlled perturbations. In particular, asymmetry and entanglement can be verified by reconstructing the state of a quantum system. Yet, this usually requires experimental and computational resources which increase exponentially with the system size. Here we show how to detect metrologically useful asymmetry and entanglement by a limited number of measurements. This is achieved by studying how they affect the speed of evolution of a system under a unitary transformation. We show that the speed of multiqubit systems can be evaluated by measuring a set of local observables, providing exponential advantage with respect to state tomography. Indeed, the presented method requires neither the knowledge of the state and the parameter-encoding Hamiltonian nor global measurements performed on all the constituent subsystems. We implement the detection scheme in an all-optical experiment.

  18. A metrology system for a high resolution cavity beam position monitor system

    Science.gov (United States)

    Walston, Sean; Boogert, Stewart; Chung, Carl; Fitsos, Pete; Frisch, Joe; Gronberg, Jeff; Hayano, Hitoshi; Hinton, Shantell; Honda, Yosuke; Khainovski, Oleg; Kolomensky, Yury; Loscutoff, Peter; Lyapin, Alexey; Malton, Stephen; May, Justin; McCormick, Douglas; Meller, Robert; Miller, David; Orimoto, Toyoko; Ross, Marc; Slater, Mark; Smith, Steve; Smith, Tonee; Terunuma, Nobuhiro; Thomson, Mark; Urakawa, Junji; Vogel, Vladimir; Ward, David; White, Glen

    2013-11-01

    International Linear Collider (ILC) interaction region beam sizes and component position stability requirements will likely be as small as a few nanometers. It is important to the ILC design effort to demonstrate that these tolerances can be achieved-ideally using a beam-based stability measurement. We developed a high resolution RF cavity Beam Position Monitor (BPM) system. A triplet of these BPMs, installed in the extraction line of the KEK Accelerator Test Facility (ATF) and tested with its ultra-low emittance beam, achieved a position measurement resolution of 15 nm. A metrology system for the three BPMs was subsequently installed. This system employed optical encoders to measure each BPM's position and orientation relative to a zero-coefficient of thermal expansion carbon fiber frame. We have demonstrated that the three BPMs behave as a rigid-body at the level of less than 5 nm.

  19. Laser metrology in food-related systems

    Science.gov (United States)

    Mendoza-Sanchez, Patricia; Lopez, Daniel; Kongraksawech, Teepakorn; Vazquez, Pedro; Torres, J. Antonio; Ramirez, Jose A.; Huerta-Ruelas, Jorge

    2005-02-01

    An optical system was developed using a low-cost semiconductor laser and commercial optical and electronic components, to monitor food processes by measuring changes in optical rotation (OR) of chiral compounds. The OR signal as a function of processing time and sample temperature were collected and recorded using a computer data acquisition system. System has been tested during two different processes: sugar-protein interaction and, beer fermentation process. To study sugar-protein interaction, the following sugars were used: sorbitol, trehalose and sucrose, and in the place of Protein, Serum Albumin Bovine (BSA, A-7906 Sigma-Aldrich). In some food processes, different sugars are added to protect damage of proteins during their processing, storage and/or distribution. Different sugar/protein solutions were prepared and heated above critical temperature of protein denaturation. OR measurements were performed during heating process and effect of different sugars in protein denaturation was measured. Higher sensitivity of these measurements was found compared with Differential Scanning Calorimetry, which needs higher protein concentration to study these interactions. The brewing fermentation process was monitored in-situ using this OR system and validated by correlation with specific density measurements and gas chromatography. This instrument can be implemented to monitor fermentation on-line, thereby determining end of process and optimizing process conditions in an industrial setting. The high sensitivity of developed OR system has no mobile parts and is more flexible than commercial polarimeters providing the capability of implementation in harsh environments, signifying the potential of this method as an in-line technique for quality control in food processing and for experimentation with optically active solutions.

  20. Toward reliable and repeatable automated STEM-EDS metrology with high throughput

    Science.gov (United States)

    Zhong, Zhenxin; Donald, Jason; Dutrow, Gavin; Roller, Justin; Ugurlu, Ozan; Verheijen, Martin; Bidiuk, Oleksii

    2018-03-01

    New materials and designs in complex 3D architectures in logic and memory devices have raised complexity in S/TEM metrology. In this paper, we report about a newly developed, automated, scanning transmission electron microscopy (STEM) based, energy dispersive X-ray spectroscopy (STEM-EDS) metrology method that addresses these challenges. Different methodologies toward repeatable and efficient, automated STEM-EDS metrology with high throughput are presented: we introduce the best known auto-EDS acquisition and quantification methods for robust and reliable metrology and present how electron exposure dose impacts the EDS metrology reproducibility, either due to poor signalto-noise ratio (SNR) at low dose or due to sample modifications at high dose conditions. Finally, we discuss the limitations of the STEM-EDS metrology technique and propose strategies to optimize the process both in terms of throughput and metrology reliability.