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Sample records for ni al films

  1. Fabrication and performance characterization of Al/Ni multilayer energetic films

    Science.gov (United States)

    Yang, Cheng; Hu, Yan; Shen, Ruiqi; Ye, Yinghua; Wang, Shouxu; Hua, Tianli

    2014-02-01

    Al/Ni multilayer bridge films, which were composed of alternate Al and Ni layers with bilayer thicknesses of 50, 100 and 200 nm, were prepared by RF magnetron sputtering. In each bilayer, the thickness ratio of Al to Ni was maintained at 3:2 to obtain an overall 1:1 atomic composition. The total thickness of Al/Ni multilayer films was 2 μm. XRD measurements show that the compound of AlNi is the final product of the exothermic reactions. DSC curves show that the values of heat release in Al/Ni multilayer films with bilayer thicknesses of 50, 100 and 200 nm are 389.43, 396.69 and 409.92 J g-1, respectively. The temperatures of Al/Ni multilayer films were obviously higher than those of Al bridge film and Ni bridge film. Al/Ni multilayer films with modulation of 50 nm had the highest electrical explosion temperature of 7000 K. The exothermic reaction in Al/Ni multilayer films leads to a more intense electric explosion. Al/Ni multilayer bridge films with modulation period of 50 nm explode more rapidly and intensely than other bridge films because decreasing the bilayer thickness results in an increased reaction velocity.

  2. Synthesis and characterization of n-type NiO:Al thin films for fabrication of p-n NiO homojunctions

    Science.gov (United States)

    Sun, Hui; Liao, Ming-Han; Chen, Sheng-Chi; Li, Zhi-Yue; Lin, Po-Chun; Song, Shu-Mei

    2018-03-01

    n-type NiO:Al thin films were deposited by RF magnetron sputtering. Their optoelectronic properties versus Al target power was investigated. The results show that with increasing Al target power, the conduction type of NiO films changes from p-type to n-type. The variation of the film’s electrical and optical properties depends on Al amount in the film. When Al target power is relatively low, Al3+ cations tend to enter nickel vacancy sites, which makes the lattice structure of NiO more complete. This improves the carrier mobility and film’s transmittance. However, when Al target power exceeds 40 W, Al atoms begin to enter into interstitial sites and form an Al cluster in the NiO film. This behavior is beneficial for improving the film’s n-type conductivity but degrades the film’s transmittance. Finally, Al/(p-type NiO)/(n-type NiO:Al)/ITO homojunctions were fabricated. Their performance was compared with Al/(p-type NiO)/ITO heterojunctions without an n-type NiO layer. Thanks to the better interface quality between the two NiO layers, the homojunctions present better performance.

  3. Shape memory effect and microstructures of sputter-deposited Cu-Al-Ni films

    International Nuclear Information System (INIS)

    Minemura, T.; Andoh, H.; Kita, Y.; Ikuta, I.

    1985-01-01

    The shape memory effect has been found in many alloy systems which exhibit a thermoelastic martensite transformation. Cu-Al-Ni alloys exhibit an excellent shape memory effect in single crystalline states, but they have not yet been commercially used due to their brittle fracture along the grain boundaries in polycrystalline states. This letter reports the shape memory effect and microstructures of the sputter-deposited Cu-Al-Ni films. Cu-14%Al-4%Ni alloy ingot was prepared. A target for sputter deposition was cut from the ingot. Aluminium foils (20 μm thick) were used for the substrates of sputter deposition. The microstructures and crystal structures of the films were investigated by transmission electron microscopy (TEM) and X-ray diffraction using CuKα radiation, respectively. The effect of the sputtering conditions such as substrate temperature, partial pressure of argon gas, and the sputtering power on the structures of sputter-deposited Cu-14%Al-4%Ni films were investigated by X-ray diffraction. Results are shown and discussed. Photographs demonstrate shape memory behaviour of Cu-14%Al-4%Ni films sputter-deposited on aluminium foils from (a) liquid nitrogen temperature to (d) room temperature. (author)

  4. A Study of Thin Film Resistors Prepared Using Ni-Cr-Si-Al-Ta High Entropy Alloy

    Directory of Open Access Journals (Sweden)

    Ruei-Cheng Lin

    2015-01-01

    Full Text Available Ni-Cr-Si-Al-Ta resistive thin films were prepared on glass and Al2O3 substrates by DC magnetron cosputtering from targets of Ni0.35-Cr0.25-Si0.2-Al0.2 casting alloy and Ta metal. Electrical properties and microstructures of Ni-Cr-Si-Al-Ta films under different sputtering powers and annealing temperatures were investigated. The phase evolution, microstructure, and composition of Ni-Cr-Si-Al-Ta films were characterized by X-ray diffraction (XRD, transmission electron microscopy (TEM, and Auger electron spectroscopy (AES. When the annealing temperature was set to 300°C, the Ni-Cr-Si-Al-Ta films with an amorphous structure were observed. When the annealing temperature was at 500°C, the Ni-Cr-Si-Al-Ta films crystallized into Al0.9Ni4.22, Cr2Ta, and Ta5Si3 phases. The Ni-Cr-Si-Al-Ta films deposited at 100 W and annealed at 300°C which exhibited the higher resistivity 2215 μΩ-cm with −10 ppm/°C of temperature coefficient of resistance (TCR.

  5. FABRICATION OF Cu-Al-Ni SHAPE MEMORY THIN FILM BY THERMAL EVOPRATION

    OpenAIRE

    Özkul, İskender; Canbay, Canan Aksu; Tekataş, Ayşe

    2017-01-01

    Among the functional, materials shape memory alloysare important because of their unique properties. So, these materials haveattracted more attention to be used in micro/nano electronic andelectromechanic systems. In this work, thermal evaporation method has been usedto produce CuAlNi shape memory alloy thin film. The produced CuAlNi thin filmhas been characterized and the presence of the martensite phase wasinvestigated and compared with the CuAlNi alloy sample. CuAlNi shape memoryalloy thin...

  6. Growth of C60 thin films on Al2O3/NiAl(100) at early stages

    Science.gov (United States)

    Hsu, S.-C.; Liao, C.-H.; Hung, T.-C.; Wu, Y.-C.; Lai, Y.-L.; Hsu, Y.-J.; Luo, M.-F.

    2018-03-01

    The growth of thin films of C60 on Al2O3/NiAl(100) at the earliest stage was studied with scanning tunneling microscopy and synchrotron-based photoelectron spectroscopy under ultrahigh-vacuum conditions. C60 molecules, deposited from the vapor onto an ordered thin film of Al2O3/NiAl(100) at 300 K, nucleated into nanoscale rectangular islands, with their longer sides parallel to direction either [010] or [001] of NiAl. The particular island shape resulted because C60 diffused rapidly, and adsorbed and nucleated preferentially on the protrusion stripes of the crystalline Al2O3 surface. The monolayer C60 film exhibited linear protrusions of height 1-3 Å, due to either the structure of the underlying Al2O3 or the lattice mismatch at the boundaries of the coalescing C60 islands; such protrusions governed also the growth of the second layer. The second layer of the C60 film grew only for a C60 coverage >0.60 ML, implying a layer-by-layer growth mode, and also ripened in rectangular shapes. The thin film of C60 was thermally stable up to 400 K; above 500 K, the C60 islands dissociated and most C60 desorbed.

  7. Soft Magnetic Properties of High-Entropy Fe-Co-Ni-Cr-Al-Si Thin Films

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    Pei-Chung Lin

    2016-08-01

    Full Text Available Soft magnetic properties of Fe-Co-Ni-Al-Cr-Si thin films were studied. As-deposited Fe-Co-Ni-Al-Cr-Si nano-grained thin films showing no magnetic anisotropy were subjected to field-annealing at different temperatures to induce magnetic anisotropy. Optimized magnetic and electrical properties of Fe-Co-Ni-Al-Cr-Si films annealed at 200 °C are saturation magnetization 9.13 × 105 A/m, coercivity 79.6 A/m, out-of-plane uniaxial anisotropy field 1.59 × 103 A/m, and electrical resistivity 3.75 μΩ·m. Based on these excellent properties, we employed such films to fabricate magnetic thin film inductor. The performance of the high entropy alloy thin film inductors is superior to that of air core inductor.

  8. Growth and characterization of ternary Ni, Mg–Al and Ni–Al layered double hydroxides thin films deposited by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Birjega, R. [National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., Magurele, 76900 Bucharest (Romania); Vlad, A., E-mail: angela.vlad@gmail.com [National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., Magurele, 76900 Bucharest (Romania); Matei, A.; Ion, V.; Luculescu, C.; Dinescu, M. [National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., Magurele, 76900 Bucharest (Romania); Zavoianu, R. [University of Bucharest, Faculty of Chemistry, Department of Chemical Technology and Catalysis, 4-12 Regina Elisabeta Bd., Bucharest (Romania)

    2016-09-01

    Layered double hydroxides (LDHs) are a class of layered materials consisting of positively charged brucite-like layers and exchangeable interlayer anions. Layered double hydroxides containing a transition metal which undergoes a reversible redox reaction in the useful potential range have been proposed as electrode coating materials due to their properties of charge transport and redox catalysts in basic solutions. Ni–Al,(Ni,Mg)–Al and, as reference, non-electronically conductive Mg–Al double hydroxides thin films were obtained via pulsed laser deposition technique. The thin films were deposited on different substrates (Si, glass) by using a Nd:YAG laser (1064 nm) working at a repetition rate of 10 Hz. X-ray diffraction, Atomic Force Microscopy, Energy Dispersive X-ray spectroscopy, Fourier Transform Infra-Red Spectroscopy, Secondary Ions Mass Spectrometry, Impedance Analyzer and ellipsometry were the techniques used for the as deposited thin films investigation. The optical properties of Ni based LDH thin films and the effect of the Ni amount on the structural, morphological and optical response are evidenced. The optical band gap values, covering a domain between 3.84 eV and 4.38 eV, respond to the Ni overall concentration: the higher Ni amount the lower the band gap value. - Highlights: • Ternary Ni, Mg–Al and Ni–Al layered double hydroxides thin films were deposited. • The effect of the nickel is evidenced. • The possibility to tailor the materials accompanied by an optical response is shown.

  9. Bulk-compositional changes of Ni2Al3 and NiAl3 during ion etching

    International Nuclear Information System (INIS)

    Chen Houwen; Wang Rong

    2008-01-01

    Bulk-compositional changes of Ni 2 Al 3 and NiAl 3 in a Ni-50 wt% Al alloy during ion etching have been investigated by transmission electron microscopy and energy dispersive X-ray spectroscopic analyses. After etching with 7, 5 and 3 keV Ar + ions for 15, 24 and 100 h nickel contents in both Ni 2 Al 3 and NiAl 3 exceeded greatly those in the initial compounds and increased with the decrement of the sputtering energy. After 100 h etching with 3 keV Ar + ions the compositions of these two compounds reached a similar value, about Ni 80-83 Al 12-15 Fe 3-4 Cr 1-2 (at%). A synergistic action of preferential sputtering, radiation-induced segregation and radiation-enhanced diffusion enables the altered-layers at the top and bottom of the film extend through the whole film. The bulk-compositional changes are proposed to occur in the unsteady-state sputtering regime of ion etching and caused by an insufficient supply of matter in a thin film

  10. Formation of epitaxial Al 2O 3/NiAl(1 1 0) films: aluminium deposition

    Science.gov (United States)

    Lykhach, Y.; Moroz, V.; Yoshitake, M.

    2005-02-01

    Structure of epitaxial Al 2O 3 layers formed on NiAl(1 1 0) substrates has been studied by means of reflection high-energy electron diffraction (RHEED). The elucidated structure was compared to the model suggested for 0.5 nm-thick Al 2O 3 layers [K. Müller, H. Lindner, D.M. Zehner, G. Ownby, Verh. Dtsch. Phys. Ges. 25 (1990) 1130; R.M. Jaeger, H. Kuhlenbeck, H.J. Freund, Surf. Sci. 259 (1991) 235]. The stepwise growth of Al 2O 3 film, involving deposition and subsequent oxidation of aluminium onto epitaxial 0.5 nm-thick Al 2O 3 layers, has been investigated. Aluminium was deposited at room temperature, whereas its oxidation took place during annealing at 1070 K. The Al 2O 3 thickness was monitored by means of Auger electron spectroscopy (AES). It was found that Al 2O 3 layer follows the structure of 0.5 nm thick Al 2O 3 film, although a tilting of Al 2O 3(1 1 1) surface plane with respect to NiAl(1 1 0) surface appeared after Al deposition.

  11. Dynamic magnetization of NiZn ferrite doped FeSiAl thin films fabricated by oblique sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Zhong, Xiaoxi, E-mail: xiaoxi.zhong@gmail.com [Sichuan Province Key Laboratory of Information Materials and Devices Application, Chengdu University of Information Technology, Chengdu 610225 (China); Phuoc, Nguyen N. [Temasek Laboratories, National University of Singapore, 5A Engineering Drive 2, Singapore 117411 (Singapore); Soh, Wee Tee [Center for Superconducting and Magnetic Materials, Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542 (Singapore); Ong, C.K. [Temasek Laboratories, National University of Singapore, 5A Engineering Drive 2, Singapore 117411 (Singapore); Center for Superconducting and Magnetic Materials, Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542 (Singapore); Li, Lezhong [Sichuan Province Key Laboratory of Information Materials and Devices Application, Chengdu University of Information Technology, Chengdu 610225 (China)

    2017-06-15

    Highlights: • We prepared NiZn ferrite doped FeSiAl-based thin films using oblique deposition technique. • The magnetic properties of FeSiAl-based thin films were systematically studied. • Two ferromagnetic resonance peaks were observed in the permeability spectra. • The thermal stability of microwave properties of FeSiAl-based films was studied. • The thermal stability of properties we studied was relatively good. - Abstract: In this study, we comprehensively investigate the dynamic magnetic properties of FeSiAl-NiZnFeO thin films prepared by the oblique deposition method via a shorted microstrip perturbation technique. For the films with higher oblique angle and NiZn ferrite doping amount, there are two ferromagnetic resonance peaks observed in the permeability spectra, and both of the two peaks originate from FeSiAl. Furthermore, the magnetic anisotropy field H{sub K} of the ferromagnetic resonance peak at higher frequency is enhanced with increasing doping amount, which is interpreted in terms of the contribution of reinforced stress-induced anisotropy and shape anisotropy brought about by doping elements and oblique sputtering method. In addition, the thermal stability of the ferromagnetic resonance frequency f{sub FMR} of FeSiAl-NiZnFeO films with oblique angles of 35° and 45° with respect to temperature ranging from 300 K to 420 K is deteriorated with increasing ferrite doping amount, which is mainly ascribed to the influence of pair-ordering anisotropy and/or the reduction of the FeSiAl grain size.

  12. Nanostructural origin of semiconductivity and large magnetoresistance in epitaxial NiCo2O4/Al2O3 thin films

    Science.gov (United States)

    Zhen, Congmian; Zhang, XiaoZhe; Wei, Wengang; Guo, Wenzhe; Pant, Ankit; Xu, Xiaoshan; Shen, Jian; Ma, Li; Hou, Denglu

    2018-04-01

    Despite low resistivity (~1 mΩ cm), metallic electrical transport has not been commonly observed in inverse spinel NiCo2O4, except in certain epitaxial thin films. Previous studies have stressed the effect of valence mixing and the degree of spinel inversion on the electrical conduction of NiCo2O4 films. In this work, we studied the effect of nanostructural disorder by comparing the NiCo2O4 epitaxial films grown on MgAl2O4 (1 1 1) and on Al2O3 (0 0 1) substrates. Although the optimal growth conditions are similar for the NiCo2O4 (1 1 1)/MgAl2O4 (1 1 1) and the NiCo2O4 (1 1 1)/Al2O3 (0 0 1) films, they show metallic and semiconducting electrical transport, respectively. Post-growth annealing decreases the resistivity of NiCo2O4 (1 1 1)/Al2O3 (0 0 1) films, but the annealed films are still semiconducting. While the semiconductivity and the large magnetoresistance in NiCo2O4 (1 1 1)/Al2O3 (0 0 1) films cannot be accounted for in terms of non-optimal valence mixing and spinel inversion, the presence of anti-phase boundaries between nano-sized crystallites, generated by the structural mismatch between NiCo2O4 and Al2O3, may explain all the experimental observations in this work. These results reveal nanostructural disorder as being another key factor for controlling the electrical transport of NiCo2O4, with potentially large magnetoresistance for spintronics applications.

  13. The Microstructures and Electrical Resistivity of (Al, Cr, TiFeCoNiOx High-Entropy Alloy Oxide Thin Films

    Directory of Open Access Journals (Sweden)

    Chun-Huei Tsau

    2015-01-01

    Full Text Available The (Al, Cr, TiFeCoNi alloy thin films were deposited by PVD and using the equimolar targets with same compositions from the concept of high-entropy alloys. The thin films became metal oxide films after annealing at vacuum furnace for a period; and the resistivity of these thin films decreased sharply. After optimum annealing treatment, the lowest resistivity of the FeCoNiOx, CrFeCoNiOx, AlFeCoNiOx, and TiFeCoNiOx films was 22, 42, 18, and 35 μΩ-cm, respectively. This value is close to that of most of the metallic alloys. This phenomenon was caused by delaminating of the alloy oxide thin films because the oxidation was from the surfaces of the thin films. The low resistivity of these oxide films was contributed to the nonfully oxidized elements in the bottom layers and also vanishing of the defects during annealing.

  14. NiTiCu/AlN/NiTiCu shape memory thin film heterostructures for vibration damping in MEMS

    Energy Technology Data Exchange (ETDEWEB)

    Kaur, Navjot; Kaur, Davinder, E-mail: dkaurfph@iitr.ernet.in

    2014-03-25

    Highlights: • Fabrication of NiTiCu/AlN/NiTiCu heterostructure using dc/rf magnetron sputtering. • Exhibits highest hardness (38 GPa) and elastic modulus (187 GPa). • Enhanced dissipation of mechanical energy (E{sub d} = 5.7 N J). • High damping capacity (0.052) and figure of merit (∼0.62). • Can be applied for vibration damping in MEMS. -- Abstract: Shape memory alloy (NiTiCu) thin films coupled with piezoelectric AlN layer produce an intelligent material for vibration damping. In the present study pure NiTiCu, NiTiCu/AlN and NiTiCu/AlN/NiTiCu heterostructures have been deposited on Si substrate using magnetron sputtering technique. By the use of the interfaces and shape memory effect provided by NiTiCu layers, the damping capacity can be increased along with increase in stiffness and mechanical hardness. The heterostructures were characterized in terms of structural, electrical, morphological and mechanical properties by X-ray diffraction (XRD), four probe resistivity method, atomic force microscopy, field emission scanning electron microscopy, and nanoindentation. The NiTiCu/AlN/NiTiCu heterostructure exhibit enhanced mechanical and damping properties as compared to NiTiCu/AlN and pure NiTiCu. This enhancement in hardness and damping of the heterostructure could be attributed to the shape memory effect of NiTiCu, intrinsic piezoelectricity of AlN and increased number of interfaces in heterostructure that help in dissipation of mechanical vibrations. The findings of this work provide additional impetus for the application of these heterostructures in emerging fields of nanotechnology and microelectro mechanical (MEMS) devices.

  15. NiTiCu/AlN/NiTiCu shape memory thin film heterostructures for vibration damping in MEMS

    International Nuclear Information System (INIS)

    Kaur, Navjot; Kaur, Davinder

    2014-01-01

    Highlights: • Fabrication of NiTiCu/AlN/NiTiCu heterostructure using dc/rf magnetron sputtering. • Exhibits highest hardness (38 GPa) and elastic modulus (187 GPa). • Enhanced dissipation of mechanical energy (E d = 5.7 N J). • High damping capacity (0.052) and figure of merit (∼0.62). • Can be applied for vibration damping in MEMS. -- Abstract: Shape memory alloy (NiTiCu) thin films coupled with piezoelectric AlN layer produce an intelligent material for vibration damping. In the present study pure NiTiCu, NiTiCu/AlN and NiTiCu/AlN/NiTiCu heterostructures have been deposited on Si substrate using magnetron sputtering technique. By the use of the interfaces and shape memory effect provided by NiTiCu layers, the damping capacity can be increased along with increase in stiffness and mechanical hardness. The heterostructures were characterized in terms of structural, electrical, morphological and mechanical properties by X-ray diffraction (XRD), four probe resistivity method, atomic force microscopy, field emission scanning electron microscopy, and nanoindentation. The NiTiCu/AlN/NiTiCu heterostructure exhibit enhanced mechanical and damping properties as compared to NiTiCu/AlN and pure NiTiCu. This enhancement in hardness and damping of the heterostructure could be attributed to the shape memory effect of NiTiCu, intrinsic piezoelectricity of AlN and increased number of interfaces in heterostructure that help in dissipation of mechanical vibrations. The findings of this work provide additional impetus for the application of these heterostructures in emerging fields of nanotechnology and microelectro mechanical (MEMS) devices

  16. RF and microwave noise suppression in a transmission line using Fe-Si-Al/Ni-Zn magnetic composite films

    International Nuclear Information System (INIS)

    Lee, J. W.; Hong, Y. K.; Kim, K.; Joo, J.; Yoon, Y. W.; Kim, S. W.; Kim, Y. B.; Kim, K. Y.

    2006-01-01

    Radio-frequency (RF) and microwave noise suppression by using magnetic composite films on a microstrip line (MSL) was studied in the frequency range from 50 MHz to 13.5 GHz. The MSL was composed of a Cu transmission line, dielectric materials, and a Cu substrate. The Fe-Si-Al/Ni-Zn magnetic composite films were placed on the MSL, and the reflection and the transmission characteristics were investigated. We observed that RF and microwave noise suppression caused by the Fe-Si-Al/Ni-Zn magnetic composite films varied with the concentration ratio of the sendust (Fe-Si-Al) and the Ni-Zn ferrite. The frequency dependence of the power loss due to the composite films on the MSL was measured and the power loss increased at higher frequencies with increasing concentration of the sendust in the composites. The electromagnetic interference shielding efficiencies of the magnetic composite films in the far-field region are also discussed.

  17. Study of Ni/Si(1 0 0) solid-state reaction with Al addition

    International Nuclear Information System (INIS)

    Huang Yifei; Jiang Yulong; Ru Guoping; Li Bingzong

    2008-01-01

    The characteristics of Ni/Si(1 0 0) solid-state reaction with Al addition (Ni/Al/Si(1 0 0), Ni/Al/Ni/Si(1 0 0) and Al/Ni/Si(1 0 0)) is studied. Ni and Al films were deposited on Si(1 0 0) substrate by ion beam sputtering. The solid-state reaction between metal films and Si was performed by rapid thermal annealing. The sheet resistance of the formed silicide film was measured by four-point probe method. The X-ray diffraction (XRD) was employed to detect the phases in the silicide film. The Auger electron spectroscopy was applied to reveal the element profiles in depth. The influence of Al addition on the Schottky barrier heights of the formed silicide/Si diodes was investigated by current-voltage measurements. The experimental results show that NiSi forms even with the addition of Al, although the formation temperature correspondingly changes. It is revealed that Ni silicidation is accompanied with Al diffusion in Ni film toward the film top surface and Al is the dominant diffusion species in Ni/Al system. However, no Ni x Al y phase is detected in the films and no significant Schottky barrier height modulation by the addition of Al is observed

  18. Comparison of Mechanical Properties of Ni[sub]3Al Thin Films in Disordered FCC and Ordered L1[sub]2 Phases

    OpenAIRE

    Nix, Wiliam D.; Saha, R.; Aziz, Michael; Hutchinson, John; Evans, Anthony G.; Huang, Yonggang

    2001-01-01

    We report the results of several experiments isolating the effect of long-range order on mechanical properties of intermetallic compounds. Kinetically disordered FCC Ni3Al (Ni 76%) thin films were produced by rapid solidification following pulsed laser melting. For comparison, compositionally and microstructurally identical films with ordered L12 structure were produced by subsequent annealing at 550 °C for 2 hours. These FCC and L12 Ni3Al thin films were tested by nanoindentation for hardnes...

  19. Helium-Charged La-Ni-Al Thin Films Deposited by Magnetron Sputtering

    International Nuclear Information System (INIS)

    Shi Liqun; Chen Deming; Xu Shilin; Liu Chaozhu; Hao Wanli; Zhou Zhuyin

    2005-01-01

    An advanced implantation of low energy helium-4 atoms during the La-Ni-Al film growth by adopting magnetron sputtering with Ar/He mixture gases is discussed. Both proton backscattering spectroscopy (PBS) and elastic recoil detection (ERD) analyses were adopted to measure helium concentration of the films and distribution in the near-surface region. Helium atoms with a high concentration incorporate evenly in deposited film. The introduction of the helium with no extra irradiation damage is expected by choosing suitable deposition conditions. It was found that amorphous and crystalline LaNi 5 -type structures can be achieved when sputtered with pure Ar and Ar/He mixture gases at room temperature, respectively. Thermal desorption experiments proposes that a part of hydrogen atoms are bound to trapped helium at crystal and releases together with helium. Only a small fraction of helium is released from the helium-vacancy clusters in lower temperature range and most of helium is released from small size helium bubbles in the high temperature range

  20. Glyphosate and glufosinate detection at electrogenerated NiAl-LDH thin films

    Energy Technology Data Exchange (ETDEWEB)

    Khenifi, Aicha [Laboratoire des Materiaux Inorganiques, UMR CNRS 6002, Universite Blaise Pascal, Clermont-Ferrand (France); Laboratoire de physico-chimie des materiaux, catalyse et environnement Usto, Oran, El M' nouar (Algeria); Derriche, Zoubir [Laboratoire de physico-chimie des materiaux, catalyse et environnement Usto, Oran, El M' nouar (Algeria); Forano, Claude; Prevot, Vanessa [Laboratoire des Materiaux Inorganiques, UMR CNRS 6002, Universite Blaise Pascal, Clermont-Ferrand (France); Mousty, Christine, E-mail: Christine.Mousty@univ-bpclermont.fr [Laboratoire des Materiaux Inorganiques, UMR CNRS 6002, Universite Blaise Pascal, Clermont-Ferrand (France); Scavetta, Erika, E-mail: scavetta@fci.unibo.it [Laboratorio di Chimica Analitica, Dipartimento di Chimica Fisica ed Inorganica, Universita degli Studi di Bologna (Italy); Ballarin, Barbara; Guadagnini, Lorella; Tonelli, Domenica [Laboratorio di Chimica Analitica, Dipartimento di Chimica Fisica ed Inorganica, Universita degli Studi di Bologna (Italy)

    2009-11-10

    An amperometric sensor based on Ni{sub 1-x}Al{sub x}(OH){sub 2}NO{sub 3x}.nH{sub 2}O layered double hydroxide (LDH) has been developed for the electrochemical analysis in one step of two herbicides: glyphosate (N-(phosphonomethyl)glycine, Glyp) and glufosinate ((DL-homoalanine-4-yl)-methylphosphinic acid, Gluf). NiAl-LDH was prepared by coprecipitation or by electrodeposition at the Pt electrode surface. Inorganic films were fully characterized by X-ray diffraction, Raman spectroscopy and scanning electron microscopy. Adsorption isotherms of Glyp onto this inorganic lamellar material have been established. Electrocatalytic oxidation of Glyp and Gluf is possible at the Ni{sup 3+} centres of the structure. The electrochemical responses of the NiAl-LDH modified electrode were obtained by cyclic voltammetry and chronoamperometry at 0.49 V/SCE as a function of herbicide concentration in 0.1 M NaOH solution. The electrocatalytic response showed a linear dependence on the Glyp concentration ranging between 0.01 and 0.9 mM with a detection limit of 1 {mu}M and sensitivity 287 mA/M cm{sup 2}. The sensitivity found for Gluf was lower (178 mA/M cm{sup 2}).

  1. Magnetic Properties of FeNi-Based Thin Film Materials with Different Additives

    Directory of Open Access Journals (Sweden)

    Cai Liang

    2014-07-01

    Full Text Available This paper presents a study of FeNi-based thin film materials deposited with Mo, Al and B using a co-sputtering process. The existence of soft magnetic properties in combination with strong magneto-mechanical coupling makes these materials attractive for sensor applications. Our findings show that FeNi deposited with Mo or Al yields magnetically soft materials and that depositing with B further increases the softness. The out-of-plane magnetic anisotropy of FeNi thin films is reduced by depositing with Al and completely removed by depositing with B. The effect of depositing with Mo is dependent on the Mo concentration. The coercivity of FeNiMo and FeNiAl is reduced to less than a half of that of FeNi, and a value as low as 40 A/m is obtained for FeNiB. The surfaces of the obtained FeNiMo, FeNiAl and FeNiB thin films reveal very different morphologies. The surface of FeNiMo shows nano-cracks, while the FeNiAl films show large clusters and fewer nano-cracks. When FeNi is deposited with B, a very smooth morphology is obtained. The crystal structure of FeNiMo strongly depends on the depositant concentration and changes into an amorphous structure at a higher Mo level. FeNiAl thin films remain polycrystalline, even at a very high concentration of Al, and FeNiB films are amorphous, even at a very low concentration of B.

  2. Magnetic properties of FeNi-based thin film materials with different additives

    KAUST Repository

    Liang, C.

    2014-07-04

    This paper presents a study of FeNi-based thin film materials deposited with Mo, Al and B using a co-sputtering process. The existence of soft magnetic properties in combination with strong magneto-mechanical coupling makes these materials attractive for sensor applications. Our findings show that FeNi deposited with Mo or Al yields magnetically soft materials and that depositing with B further increases the softness. The out-of-plane magnetic anisotropy of FeNi thin films is reduced by depositing with Al and completely removed by depositing with B. The effect of depositing with Mo is dependent on the Mo concentration. The coercivity of FeNiMo and FeNiAl is reduced to less than a half of that of FeNi, and a value as low as 40 A/m is obtained for FeNiB. The surfaces of the obtained FeNiMo, FeNiAl and FeNiB thin films reveal very different morphologies. The surface of FeNiMo shows nano-cracks, while the FeNiAl films show large clusters and fewer nano-cracks. When FeNi is deposited with B, a very smooth morphology is obtained. The crystal structure of FeNiMo strongly depends on the depositant concentration and changes into an amorphous structure at a higher Mo level. FeNiAl thin films remain polycrystalline, even at a very high concentration of Al, and FeNiB films are amorphous, even at a very low concentration of B. 2014 by the authors.

  3. Nanocrystalline soft ferromagnetic Ni-Co-P thin film on Al alloy by low temperature electroless deposition

    International Nuclear Information System (INIS)

    Aal, A. Abdel; Shaaban, A.; Hamid, Z. Abdel

    2008-01-01

    Soft ferromagnetic ternary Ni-Co-P films were deposited onto Al 6061 alloy from low temperature Ni-Co-P electroless plating bath. The effect of deposition parameters, such as time and pH, on the plating rate of the deposit were examined. The results showed that the plating rate is a function of pH bath and the highest coating thickness can be obtained at pH value from 8 to10. The surface morphology, phase structure and the magnetic properties of the prepared films have been investigated using scanning electron microscopy (SEM), X-ray diffraction analysis (XRD) and vibrating magnetometer device (VMD), respectively. The deposit obtained at optimum conditions showed compact and smooth with nodular grains structure and exhibited high magnetic moments and low coercivety. Potentiodynamic polarization corrosion tests were used to study the general corrosion behavior of Al alloys, Ni-P and Ni-Co-P coatings in 3.5% NaCl solution. It was found that Ni-Co-P coated alloy demonstrated higher corrosion resistance than Ni-P coating containing same percent of P due to the Co addition. The Ni-Co-P coating with a combination of high corrosion resistance, high hardness and excellent magnetic properties would be expected to enlarge the applications of the aluminum alloys

  4. Microstructure and mechanical properties of sputter deposited Ni/Ni{sub 3}Al multilayer films at elevated temperature

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Chao [Shanghai Key Laboratory of Materials Laser Processing and Modification, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240 (China); Collaborative Innovation Center for Advanced Ship and Deep-Sea Exploration, Shanghai 200240 (China); Feng, Kai, E-mail: fengkai@sjtu.edu.cn [Shanghai Key Laboratory of Materials Laser Processing and Modification, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240 (China); Collaborative Innovation Center for Advanced Ship and Deep-Sea Exploration, Shanghai 200240 (China); Li, Zhuguo, E-mail: lizg@sjtu.edu.cn [Shanghai Key Laboratory of Materials Laser Processing and Modification, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240 (China); Collaborative Innovation Center for Advanced Ship and Deep-Sea Exploration, Shanghai 200240 (China); Lu, Fenggui; Huang, Jian; Wu, Yixiong [Shanghai Key Laboratory of Materials Laser Processing and Modification, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240 (China); Collaborative Innovation Center for Advanced Ship and Deep-Sea Exploration, Shanghai 200240 (China)

    2016-08-15

    Highlights: • Ni/Ni{sub 3}Al multilayers are prepared by magnetron sputtering. • Both grain size and phase constitution of annealed Ni/Ni{sub 3}Al multilayers are dependent on individual layer thickness. • The hardness of annealed Ni/Ni{sub 3}Al multilayers varies with individual layer thickness and annealing temperature. • 40 nm Ni/Ni{sub 3}Al multilayer exhibits excellent hardness at elevated temperature. - Abstract: Nano-structured Ni/Ni{sub 3}Al multilayer was prepared by magnetron sputtering, with individual layer thicknesses h varying from 10 to 160 nm. The microstructure and hardness of Ni/Ni{sub 3}Al multilayer were investigated by X-ray diffraction, transmission electron microscopy and nanoindentation. The results show that the hardness increases with decreasing h for as-deposited and 500 °C annealed multilayers. When annealed at 700 °C, the hardness approach a peak value at h = 40 nm with followed by softening at smaller h. The influence of individual layer thickness, grain size as well as formation of ordered Ni{sub 3}Al on strengthening mechanisms of Ni/Ni{sub 3}Al multilayers at elevated temperature are discussed.

  5. Semiconducting p-type MgNiO:Li epitaxial films fabricated by cosputtering method

    Energy Technology Data Exchange (ETDEWEB)

    Kwon, Yong Hun; Chun, Sung Hyun; Cho, Hyung Koun [School of Advanced Materials Science and Engineering, Sungkyunkwan University, 300 Cheoncheon-dong, Jangan-gu, Suwon, Gyeonggi-do 440-746 (Korea, Republic of)

    2013-07-15

    Li-doped ternary Mg{sub x}Ni{sub 1-x}O thin films were deposited on (0001) Al{sub 2}O{sub 3} substrates by a radio frequency (RF) magnetron cosputtering method with MgO and NiO:Li targets. The Mg mole fraction and Li content were relatively controlled by changing RF power for the MgO target over a range of 0-300 W, while the NiO:Li target was kept at 150 W. As a result, all films were epitaxially grown on (0001) Al{sub 2}O{sub 3} substrates with the relationship of [110]{sub NiO}||[1110]{sub Al2O3}, [112]{sub NiO}||[2110]{sub Al2O3} (in-plane), and [111]{sub NiO}||[0001]{sub Al2O3} (out-of-plane), and showed p-type semiconducting properties. Furthermore, from x-ray diffraction patterns, the authors found that MgO was effectively mixed with NiO:Li without structural deformation due to low lattice mismatch (0.8%) between NiO and MgO. However, the excess Li contents degraded the crystallinity of the MgNiO films. The band-gap of films was continuously shifted from 3.66 eV (339 nm) to 4.15 eV (299 nm) by the RF power of the MgO target. A visible transmittance of more than 80% was exhibited at RF powers higher than 200 W. Ultimately, the electrical resistivity of p-type MgNiO films was improved from 7.5 to 673.5 {Omega}cm, indicating that the Li-doped MgNiO films are good candidates for transparent p-type semiconductors.

  6. Effects of the Buffer Layers on the Adhesion and Antimicrobial Properties of the Amorphous ZrAlNiCuSi Films

    Science.gov (United States)

    Chiang, Pai-Tsung; Chen, Guo-Ju; Jian, Sheng-Rui; Shih, Yung-Hui

    2011-06-01

    To extend the practical applications of the bulk metallic glasses (BMGs), the preparation of the metallic glass coatings on various substrates becomes an important research issue. Among the interfacial properties of the coatings, the adhesion between films and substrates is the most crucial. In this study, amorphous Zr61Al7.5Ni10Cu17.5Si4 (ZrAlNiCuSi) thin films were deposited on SUS304 stainless steel at various sputtering powers by DC sputtering. According to the scratch tests, the introduction of the Cr and Ti buffer layers effectively improves the adhesion between the amorphous thin films and substrate without changing the surface properties, such as roughness and morphology. The antimicrobial results show that the biological activities of these microbes, except Acinetobacter baumannii, are effectively suppressed during the test period.

  7. Measurements of short-range ordering in Ni3Al

    International Nuclear Information System (INIS)

    Okamoto, J.K.; Ahn, C.C.

    1992-01-01

    This paper reports on extended electron energy-loss fine structure (EXELFS) that has been used to measure short-range ordering in Ni 3 Al. Films of fcc Ni 3 Al with suppressed short-range order synthesized by vacuum evaporation of Ni 3 Al onto room temperature substrates. EXELFS data were taken from both Al K and Ni L 23 edges. The development of short-range order was observed after the samples were annealed for various times at temperatures below 350 degrees C. Upon comparison with ab initio planewave EXELFS calculations, it was found that the Warren-Cowley short-range order parameter a(1nn) changed by about -0.1 after 210 minutes of annealing at 150 degrees C

  8. Giant magnetoimpedance effect in sputtered single layered NiFe film and meander NiFe/Cu/NiFe film

    International Nuclear Information System (INIS)

    Chen, L.; Zhou, Y.; Lei, C.; Zhou, Z.M.; Ding, W.

    2010-01-01

    Giant magnetoimpedance (GMI) effect on NiFe thin film is very promising due to its application in developing the magnetic field sensors with highly sensitivity and low cost. In this paper, the single layered NiFe thin film and NiFe/Cu/NiFe thin film with a meander structure are prepared by the MEMS technology. The influences of sputtering parameters, film structure and conductor layer width on GMI effect in NiFe single layer and meander NiFe/Cu/NiFe film are investigated. Maximum of the GMI ratio in single layer and sandwich film is 5% and 64%, respectively. The results obtained are useful for developing the high-performance magnetic sensors based on NiFe thin film.

  9. Direct characterization of phase transformations and morphologies in moving reaction zones in Al/Ni nanolaminates using dynamic transmission electron microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Kim, J.S., E-mail: judy.kim@materials.ox.ac.uk [Condensed Matter and Materials Division, Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, CA 94550 (United States); Chemical Engineering and Materials Science/Molecular and Cellular Biology, University of California-Davis, 1 Shields Avenue, Davis, CA 95616 (United States); LaGrange, T.; Reed, B.W. [Condensed Matter and Materials Division, Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, CA 94550 (United States); Knepper, R.; Weihs, T.P. [Department of Materials Science and Engineering, Johns Hopkins University, 3400 N. Charles St., Baltimore, MD 21218 (United States); Browning, N.D. [Condensed Matter and Materials Division, Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, CA 94550 (United States); Chemical Engineering and Materials Science/Molecular and Cellular Biology, University of California-Davis, 1 Shields Avenue, Davis, CA 95616 (United States); Campbell, G.H. [Condensed Matter and Materials Division, Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, CA 94550 (United States)

    2011-05-15

    Highlights: > Fast phase transformations are examined in Al/Ni reactive nanolaminates. > Results visible only by dynamic transmission electron microscopy at ns resolution. > NiAl forms under 15 ns after reaction front in all three stoichiometries studied. > DTEM imaging reveals a transient cellular morphology in nonequiatomic films. - Abstract: Phase transformations and transient morphologies are examined as exothermic formation reactions self-propagate across Al/Ni nanolaminate films. The rapid evolution of these phases and sub-micrometer morphological features requires nanoscale temporal and spatial resolution that is not available with traditional in situ electron microscopy. This work uses dynamic transmission electron microscopy to identify intermetallic products and phase morphologies, as exothermic formation reactions self-propagate in nanolaminate films grown with 3:2, 2:3 and 1:1 Al/Ni atomic ratios. Single-shot diffraction patterns with 15 ns temporal resolution reveal that the NiAl intermetallic forms within {approx}15 ns of the reaction front's arrival in all three types of films and is the only intermetallic phase to form, as the reactions self-propagate and quench very rapidly. Time-resolved imaging reveals a transient cellular morphology in the Al-rich and Ni-rich foils, but not in the equiatomic films. The cellular features in the Al-rich and Ni-rich films are attributed to a cooling trajectory through a two-phase field of liquid + NiAl.

  10. Calculation of Gibbs energy of Zr-Al-Ni, Zr-Al-Cu, Al-Ni-Cu and Zr-Al-Ni-Cu liquid alloys based on quasiregular solution model

    International Nuclear Information System (INIS)

    Li, H.Q.; Yang, Y.S.; Tong, W.H.; Wang, Z.Y.

    2007-01-01

    With the effects of electronic structure and atomic size being introduced, the mixing enthalpy as well as the Gibbs energy of the ternary Zr-Al-Cu, Ni-Al-Cu, Zr-Ni-Al and quaternary Zr-Al-Ni-Cu systems are calculated based on quasiregular solution model. The computed results agree well with the experimental data. The sequence of Gibbs energies of different systems is: G Zr-Al-Ni-Cu Zr-Al-Ni Zr-Al-Cu Cu-Al-Ni . To Zr-Al-Cu, Ni-Al-Cu and Zr-Ni-Al, the lowest Gibbs energy locates in the composition range of X Zr 0.39-0.61, X Al = 0.38-0.61; X Ni = 0.39-0.61, X Al = 0.38-0.60 and X Zr = 0.32-0.67, X Al = 0.32-0.66, respectively. And to the Zr-Ni-Al-Cu system with 66.67% Zr, the lowest Gibbs energy is obtained in the region of X Al = 0.63-0.80, X Ni = 0.14-0.24

  11. Photoconducting and photocapacitance properties of Al/p-CuNiO{sub 2}-on-p-Si isotype heterojunction photodiode

    Energy Technology Data Exchange (ETDEWEB)

    Elsayed, I.A. [Physics Department, College of Science and Humanitarian Studies, Salman bin Abdulaziz University (Saudi Arabia); Physics Department, Faculty of Science, Damietta University (Egypt); Çavaş, Mehmet [Department of Mechatronics, Faculty of Technology, Firat University, Elazig (Turkey); Gupta, R. [Department of Chemistry, Pittsburg State University, Pittsburg, KS 66762 (United States); Fahmy, T. [Physics Department, College of Science and Humanitarian Studies, Salman bin Abdulaziz University (Saudi Arabia); Polymer Research Group, Physics Department, Faculty of Science, Mansoura University (Egypt); Al-Ghamdi, Ahmed A. [Department of Physics, Faculty of Science, King Abdulaziz University, Jeddah 21589 (Saudi Arabia); Yakuphanoglu, F., E-mail: fyhan@hotmail.com [Department of Physics, Faculty of Science, King Abdulaziz University, Jeddah 21589 (Saudi Arabia); Physics Department, Faculty of Science, Firat University, Elazig (Turkey)

    2015-07-25

    Highlights: • The CuNiO{sub 2} thin film was prepared by sol gel method. • The diode has a high photosensitivity value of 1.02 × 10{sup 3} under 100 mW/cm{sup 2}. • Al/p-Si/CuNiO{sub 2}/Al can used in optoelectronic device applications. - Abstract: Thin film of CuNiO{sub 2} was prepared by sol gel method to fabricate a photodiode. The surface morphology of the CuNiO{sub 2} thin film was investigated by atomic force microscopy (AFM). AFM results indicated that CuNiO{sub 2} film was formed from the nanoparticles and the average size of the nanoparticles was about 115 nm. The optical band gap of CuNiO{sub 2} film was calculated using optical data and was found to be about 2.4 eV. A photodiode having a structure of Al/p-Si/CuNiO{sub 2}/Al was prepared. The electronic parameters such as ideality factor and barrier height of the diode were determined and were obtained to be 8.23 and 0.82 eV, respectively. The interface states properties of the Al/p-Si/CuNiO{sub 2}/Al diode was performed using capacitance–voltage and conductance–voltage characteristics. The series resistance of the Al/p-Si/CuNiO{sub 2}/Al photo diode was observed to be decreasing with increasing frequency. The diode exhibited a photoconducting behavior with a high photosensitivity value of 1.02 × 10{sup 3} under 100 mW/cm{sup 2}. The obtained results indicate that Al/p-Si/CuNiO{sub 2}/Al can used in optoelectronic device applications.

  12. Microstructural evaluation of NiTi-based films deposited by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Crăciunescu, Corneliu M., E-mail: corneliu.craciunescu@upt.ro; Mitelea, Ion, E-mail: corneliu.craciunescu@upt.ro; Budău, Victor, E-mail: corneliu.craciunescu@upt.ro [Department of Materials and Manufacturing Engineering, Politehnica University of Timisoara (Romania); Ercuţa, Aurel [Department of Materials and Manufacturing Engineering, Politehnica University of Timisoara and Department of Physics, West University Timisoara (Romania)

    2014-11-24

    Shape memory alloy films belonging to the NiTi-based systems were deposited on heated and unheated substrates, by magnetron sputtering in a custom made system, and their structure and composition was analyzed using electron microscopy. Several substrates were used for the depositions: glass, Cu-Zn-Al, Cu-Al-Ni and Ti-NiCu shape memory alloy ribbons and kapton. The composition of the Ti-Ni-Cu films showed limited differences, compared to the one of the target and the microstructure for the DC magnetron sputtering revealed crystallized structure with features determined on peel off samples from a Si wafer. Both inter and transcrystalline fractures were observed and related to the interfacial stress developed on cooling from deposition temperature.

  13. Microstructure and mechanical properties of multiphase NiAl-based alloys

    Science.gov (United States)

    Pank, D. R.; Koss, D. A.; Nathal, M. V.

    1990-01-01

    The effect of the gamma-prime phase on the deformation behavior and fracture resistance of melt-spun ribbons and consolidated bulk specimens of a series of Nial-based alloys with Co and Hf additions has been examined. The morphology, location, and volume fraction of the gamma-prime phase are significant factors in enhancing the fracture resistance of the normally brittle NiAl-based alloys. In particular, the results indicate that a continuous-grain-boundary film of gamma-prime can impart limited room-temperature ductility regardless of whether B2 or L10 NiAl is present. Guidelines for microstructure control in multiphase NiAl-based alloys are also presented.

  14. Fabrication and Characterization of Al/NiO Energetic Nanomultilayers

    Directory of Open Access Journals (Sweden)

    YiChao Yan

    2015-01-01

    Full Text Available The redox reaction between Al and metallic oxide has its advantage compared with intermetallic reaction and Al/NiO nanomutlilayers are a promising candidate for enhancing the performance of energetic igniter. Al/NiO nanomutlilayers with different modulation periods are prepared on alumina substrate by direct current (DC magnetron sputtering. The thicknesses of each period are 250 nm, 500 nm, 750 nm, 1000 nm, and 1500 nm, respectively, and the total thickness is 3 μm. The X-ray diffraction (XRD and scanning electron microscope (SEM results of the as-deposited Al/NiO nanomutlilayers show that the NiO films are amorphous and the layered structures are clearly distinguished. The X-ray photoelectron spectroscopy (XPS demonstrates that the thickness of Al2O3 increases on the side of Al monolayer after annealing at 450°C. The thermal diffusion time becomes greater significantly as the amount of thermal boundary conductance across the interfaces increases with relatively smaller modulation period. Differential scanning calorimeter (DSC curve suggests that the energy release per unit mass is below the theoretical heat of the reaction due to the nonstoichiometric ratio between Al and NiO and the presence of impurities.

  15. Atomistic calculations of hydrogen interactions with Ni3Al grain boundaries and Ni/Ni3Al interfaces

    International Nuclear Information System (INIS)

    Baskes, M.I.; Angelo, J.E.; Moody, N.R.

    1995-01-01

    Embedded Atom Method (EAM) potentials have been developed for the Ni/Al/H system. The potentials have been fit to numerous properties of this system. For example, these potentials represent the structural and elastic properties of bulk Ni, Al, Ni 3 Al, and NiAl quite well. In addition the potentials describe the solution and migration behavior of hydrogen in both nickel and aluminum. A number of calculations using these potentials have been performed. It is found that hydrogen strongly prefers sites in Ni 3 Al that are surrounded by 6 Ni atoms. Calculations of the trapping of hydrogen to a number of grain boundaries in Ni 3 Al have been performed as a function of hydrogen chemical potential at room temperature. The failure of these bicrystals under tensile stress has been examined and will be compared to the failure of pure Ni 3 Al boundaries. Boundaries containing a preponderance of nickel are severely weakened by hydrogen. In order to investigate the potential embrittlement of γ/γ' alloys, trapping of hydrogen to a spherical Ni 3 Al precipate in nickel as a function of chemical potential at room temperature has been calculated. It appears that the boundary is not a strong trap for hydrogen, hence embrittlement in these alloys is not primarily due to interactions of hydrogen with the γ/γ interface

  16. Ternary NiFeX as soft biasing film in a magnetoresistive sensor

    Science.gov (United States)

    Chen, Mao-Min; Gharsallah, Neila; Gorman, Grace L.; Latimer, Jacquie

    1991-04-01

    The properties of NiFeX ternary films (X being Al, Au, Nb, Pd, Pt, Si, and Zr) have been studied for soft-film biasing of the magnetoresistive (MR) trilayer sensor. In general, the addition of the element X into the NiFe alloy film decreases the saturation magnetization Bs and magnetoresistance coefficient of the film, while increasing the film's electrical resistivity ρ. One of the desirable properties of a soft film for biasing is high sheet resistance for minimum current flow. A figure of merit Bsρ that takes into account both the rate of increase in Bs and the rate of decrease in ρ when adding X element was derived to compare the effectiveness of various X elements in reducing the current shunting through the soft-film layer. Using this criterion, NiFeNb and NiFeZr emerge as good soft-film materials having a maximum sheet resistance relative to the MR layer. Other critical properties such as magnetoresistance coefficient, magnetostriction, coercivity, and anisotropy field were also examined and are discussed in this paper.

  17. Low resistivity of Ni–Al co-doped ZnO thin films deposited by DC magnetron sputtering at low sputtering power

    Energy Technology Data Exchange (ETDEWEB)

    Lee, JongWoo [Department of Materials Science and Engineering, Pusan National University, San 30 Jangjeon-dong, Geumjeong-gu, Busan 609-735 (Korea, Republic of); Hui, K.N. [Department of Mechanical Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791 (Korea, Republic of); Hui, K.S., E-mail: kshui@hanyang.ac.kr [Department of Mechanical Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791 (Korea, Republic of); Cho, Y.R., E-mail: yescho@pusan.ac.kr [Department of Materials Science and Engineering, Pusan National University, San 30 Jangjeon-dong, Geumjeong-gu, Busan 609-735 (Korea, Republic of); Chun, Ho-Hwan [Global Core Research Center for Ships and Offshore Plants (GCRC-SOP), Pusan National University, San 30 Jangjeon-dong, Geumjeong-gu, Busan 609-735 (Korea, Republic of)

    2014-02-28

    Ni–Al co-doped ZnO (NiAl:ZnO) thin films were deposited on glass substrates by DC magnetron sputtering in Ar using a single ceramic, spark-plasma-sintered target with 2 wt% Al and 5 wt% Ni. The effects of the sputtering power and gas pressure on the NiAl:ZnO films were studied. The structural, electrical, and optical properties of the films were characterized by X-ray diffraction, field emission scanning electron microscopy, Hall effect measurements and UV–vis transmission spectroscopy. As the sputtering power and gas pressure increased, the crystallinity, electrical properties and optical band gap of the films were improved. The NiAl:ZnO film deposited at 40 W at 6.0 mTorr had the strongest (0 0 2) XRD peak and the lowest resistivity of approximately 2.19 × 10{sup −3} Ω cm with an optical transmittance of 90%.

  18. PRECIPITATION HARDENING IN B2-ORDERED NiAl BY Ni2AlTiCOMPOUND

    Institute of Scientific and Technical Information of China (English)

    W.H. Tian; K. Ohishi; M. Nemoto

    2001-01-01

    Microstructural variations and correlated hardness changes in B2-ordered NiAl containing fine precipitation of Ni2AlTi have been investigated by means of transmission electron microscopy (TEM) and hardness tests. The amount of age hardening is not large as compared to the large microstructural variations during aging. TEM observations have revealed that the L21-type Ni2AlTi precipitates keep a lattice coherency with the NiAl matrix at the beginning of aging. By longer periods of aging Ni2AlTi precipitates lose their coherency and change their morphology to the globular ones surrounded by misfit dislocations. The temperature dependence of the yield strength of precipitate-containing B2-ordered NiAl was investigated by compression tests over the temperature range of 873-1273K. The fine precipitation of Ni2AlTi was found to enhance greatly the yield strength and the high-temperature strength is comparison with that of superalloy Mar-M200.``

  19. Combustion Synthesis Reaction Behavior of Cold-Rolled Ni/Al and Ti/Al Multilayers

    Science.gov (United States)

    2011-04-01

    reaction modes of the films. Anselmi-Tamburini and Munir (21) studied the 2 SHS reaction in laminated Ni/Al foils and established a sequence of... convolution of three peaks. The very large broad peak, centered on position C, contains a superimposed peak appearing as a shoulder (position A) and a

  20. Thermal oxidation of Zr–Cu–Al–Ni amorphous metal thin films

    International Nuclear Information System (INIS)

    Oleksak, R.P.; Hostetler, E.B.; Flynn, B.T.; McGlone, J.M.; Landau, N.P.; Wager, J.F.; Stickle, W.F.; Herman, G.S.

    2015-01-01

    The initial stages of thermal oxidation for Zr–Cu–Al–Ni amorphous metal thin films were investigated using X-ray photoelectron spectroscopy, transmission electron microscopy and energy dispersive X-ray spectroscopy. The as-deposited films had oxygen incorporated during sputter deposition, which helped to stabilize the amorphous phase. After annealing in air at 300 °C for short times (5 min) this oxygen was found to segregate to the surface or buried interface. Annealing at 300 °C for longer times leads to significant composition variation in both vertical and lateral directions, and formation of a surface oxide layer that consists primarily of Zr and Al oxides. Surface oxide formation was initially limited by back-diffusion of Cu and Ni ( 30 min). The oxidation properties are largely consistent with previous observations of Zr–Cu–Al–Ni metallic glasses, however some discrepancies were observed which could be explained by the unique sample geometry of the amorphous metal thin films. - Highlights: • Thermal oxidation of amorphous Zr–Cu–Al–Ni thin films was investigated. • Significant short-range inhomogeneities were observed in the amorphous films. • An accumulation of Cu and Ni occurs at the oxide/metal interface. • Diffusion of Zr was found to limit oxide film growth.

  1. Chemical and electrical characteristics of annealed Ni/Au and Ni/Ir/Au contacts on AlGaN

    Energy Technology Data Exchange (ETDEWEB)

    Ngoepe, P.N.M., E-mail: phuti.ngoepe@up.ac.za [Department of Physics, University of Pretoria, Private Bag X20, Hatfield 0028 (South Africa); Meyer, W.E.; Auret, F.D.; Omotoso, E.; Diale, M. [Department of Physics, University of Pretoria, Private Bag X20, Hatfield 0028 (South Africa); Swart, H.C.; Duvenhage, M.M.; Coetsee, E. [Department of Physics, University of the Free State, P.O. Box 339, Bloemfontein 9300 (South Africa)

    2016-01-01

    The evolution of Ni/Au and Ni/Ir/Au metal contacts deposited on AlGaN was investigated at different annealing temperatures. The samples were studied with electrical and chemical composition techniques. I–V characteristics of the Schottky diodes were optimum after 500 and 600 °C annealing for Ni/Au and Ni/Ir/Au based diodes, respectively. The depth profiles of the contacts were measured by x-ray photoelectron spectroscopy and time of flight secondary ion mass spectroscopy. These chemical composition techniques were used to examine the evolution of the metal contacts in order to verify the influence the metals have on the electrical properties of the diodes. The insertion of Ir as a diffusion barrier between Ni and Au effected the electrical properties, improving the stability of the contacts at high temperatures. Gold diffused into the AlGaN film, degrading the electrical properties of the Ni/Au diode. At 500 °C, the insertion of Ir, however, prevented the in-diffusion of Au into the AlGaN substrate.

  2. Ti Ni shape memory alloy film-actuated microstructures for a MEMS probe card

    Science.gov (United States)

    Namazu, Takahiro; Tashiro, Youichi; Inoue, Shozo

    2007-01-01

    This paper describes the development of a novel silicon (Si) cantilever beam device actuated by titanium-nickel (Ti-Ni) shape memory alloy (SMA) films. A Ti-Ni SMA film can yield high work output per unit volume, so a Ti-Ni film-actuated Si cantilever beam device is a prospective tool for use as a microelectromechanical system (MEMS) probe card that provides a relatively large contact force between the probe and electrode pad in spite of its minute size. Before fabrication of the device, the thermomechanical deformation behavior of Ti-Ni SMA films with various compositions was investigated in order to determine a sufficient constituent film for a MEMS actuator. As a result, Ti-Ni films having a Ti content of 50.2 to 52.6 atomic% (at%) were found to be usable for operation as a room temperature actuator. We have developed a Ti-Ni film-actuated Si cantilever beam device, which can produce a contact force by the cantilever bending when in contact, and also by the shape memory effect (SME) of the Ti-Ni film arising from Joule heating. The SME of the Ti-Ni film can generate an additional average contact force of 200 µN with application of 500 mW to the film. In addition to physical contact, a dependable electric contact between the Au film-coated probe tip and the Al film electrode was achieved. However, the contact resistance exhibited an average value of 25 Ω, which would have to be reduced for practical use. Reliability tests confirmed the durability of the Ti-Ni film-actuated Si cantilever-beam, in that the contact resistance was constant throughout a large number of physical contacts (>104 times).

  3. Charge-transport in Josephson-junctions with ferromagnetic Ni3Al-interlayer

    International Nuclear Information System (INIS)

    Born, F.

    2006-01-01

    The present dissertation reports on experimental studies about superconducting coupling through a thin Ni 76 Al 24 film. A new patterning process has been developed, which allows in combination with the wedge shaped deposition technique the in situ deposition of 20 single Nb/Al/Al 2 O 3 /Ni 3 Al/Nb multilayers, each with its own well defined Ni 3 Al thickness. Every single multilayer consists of 10 different sized Josephson junctions, showing a high reproducibility and scaling with its junction area. Up to six damped oscillations of the critical current density against F-layer thickness were observed, revealing three single 0-π-transitions in the ground state of Josephson junctions. Contrary to former experimental studies, the exponential decay length is one magnitude larger than the oscillation period defining decay length. The theoretical predictions based on linearised Eilenberger equations results in excellent agreement of theory and experimental results. (orig.)

  4. Microstructural development in NiAl/Ni-Si-B/Ni transient liquid phase bonds

    International Nuclear Information System (INIS)

    Gale, W.F.; Orel, S.V.

    1996-01-01

    A transmission electron microscopy (TEM) based investigation of microstructural development during transient liquid phase bonding of near-stoichiometric NiAl to commercial purity nickel is presented in this article. The work described employed Ni-4.5 wt pct Si-3.2 wt pct B (BNi-3) melt-spun interlayers. The precipitation of both Ni-Al based phases and borides within the joint and adjacent substrate regions is discussed. The article considers martensite formation (within the NiAl substrate) and the precipitation of L1 2 type phases (both within the joint and at the interface with the NiAl substrate). The relative roles of the two substrate materials (NiAl and Ni) in the isothermal resolidification process are identified. The preferential formation of Ni 3 B boride phases in the Ni substrate near the original location of the Ni substrate-joint interface is discussed and contrasted with the absence of similar events in the NiAl substrate

  5. Production of hard hydrophilic Ni-B coatings on hydrophobic Ni-Ti and Ti-6Al-4V alloys by electroless deposition

    Energy Technology Data Exchange (ETDEWEB)

    Buelbuel, Ferhat; Karabudak, Filiz; Yesildal, Ruhi [Ataturk Univ., Erzurum (Turkey). Mechanical Engineering Dept.

    2017-07-01

    This paper is mainly focused on the wetting state of liquid droplets on Ni-Ti and Ti-6Al-4V hierarchical structured hydrophobic surfaces in micro/nanoscale. Electroless Ni-B deposition as a surface coating treatment has recently drawn considerable attention of researchers owing to remarkable advantages when compared with other techniques such as low price, conformal ability to coat substrates, good bath stability and relatively easier plating process control. The Ni-Ti and Ti-6Al-4V substrates were plated by electroless Ni-B plating process. The coated films were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), hardness testing and static contact angle measurement. Results obtained from the analyses show that electroless Ni-B deposition may improve the hardness and wettability of the Ni-Ti and Ti-6Al-4V alloy surfaces.

  6. Microstructural characterisation of Ni75Al25 and Ni31.5Al68.5 powder particles produced by gas atomisation

    International Nuclear Information System (INIS)

    García-Escorial, A.; Lieblich, M.

    2014-01-01

    Highlight: ► Successful production of gas atomised Ni75Al25 and Ni31.5Al68.5 powder particles. ► Characterization of the as-solidified microstructure of 75 Al 25 and Ni 31.5 Al 68.5 at.% powder particles below 100 μm in size have been studied. The gas atomised Ni 75 Al 25 powder particles are mainly spherical. The solidification of this alloy is very fast, and its microstructure consists of a dendrite and lamellar structure of partially ordered γ-(Ni), γ′-Ni 3 Al L1 2 phase, and β-NiAl phase. The order increases with the powder particle size. The gas atomised Ni 31.5 Al 68.5 powder particles are also spherical in shape. The microstructure consists of Ni 2 Al 3 dendrites with interdendritic peritectic NiAl 3 and eutectic NiAl 3 + α-Al. The amount of the Ni 2 Al 3 increases as the cooling rate increases. NiAl phase is absent in the gas atomised Ni 31.5 Al 68.5 powder

  7. Ni3Si surface-film formation caused by radiation-induced segregation

    International Nuclear Information System (INIS)

    Potter, D.I.; Rehn, L.E.; Okamoto, P.R.; Wiedersich, H.

    1977-01-01

    Several advanced alloys being considered for reactor applications contain the ordered γ' phase Ni 3 X in which the X component is frequently Al, Si and/or Ti. These alloys are precipitation hardened, and their strength depends upon the volume fraction, size, and spatial distribution of the coherent γ' precipitate. The investigation shows that a substantial Ni 3 Si precipitate film forms on the surface of irradiated specimens of solid-solution as well as two-phase Ni-Si alloys

  8. Electronic structure of Ni/sub 3/Al and Ni/sub 3/Ga alloys

    CERN Document Server

    Pong, W F; Chang, Y K; Tsai, M H; Hsieh, H H; Pieh, J Y; Tseng, P K; Lee, J F; Hsu, L S

    1999-01-01

    This work investigates the charge transfer and Al(Ga) p-Ni d hybridization effects in the intermetallic Ni/sub 3/Al(Ni/sub 3/Ga) alloy using the NiL/sub 3.2/- and K-edge and Al(Ga)K X-ray absorption near edge structure (XANES) measurements. We find that the intensity of white-line features at the NiL/sub 3.2/-edge in the Ni/sub 3/Al(Ni /sub 3/Ga) alloy decreased in comparison with that of pure Ni, which can be attributed to the enhancement of Ni3d states filling and the depletion of the density of Ni 3d unoccupied states in the Ni/sub 3 /Al(Ni/sub 3/Ga) alloy. Two clear features are also observed in the Ni/sub 3/Al(Ni/sub 3/Ga) XANES spectrum at the Al(Ga) K-edge, which can be assigned to the Al(Ga) unoccupied 3p (4p) states and their hybridized states with the Ni 3d/4sp states above the Fermi level in Ni/sub 3/Al(Ni/sub 3/Ga). The threshold at Al K-edge XANES for Ni/sub 3/Al clearly shifts towards higher photon energies relative to that of pure Al, indicating that Al loses charges upon forming Ni/sub 3 /Al. ...

  9. The investigation of ZnO:Al2O3/metal composite back reflectors in amorphous silicon germanium thin film solar cells

    Institute of Scientific and Technical Information of China (English)

    Wang Guang-Hong; Zhao Lei; Yan Bao-Jun; Chen Jing-Wei; Wang Ge; Diao Hong-Wei; Wang Wen-Jing

    2013-01-01

    Different aluminum-doped ZnO (AZO)/metal composite thin films,including AZO/Ag/Al,AZO/Ag/nickelchromium alloy (NiCr),and AZO/Ag/NiCr/Al,are utilized as the back reflectors of p-i-n amorphous silicon germanium thin film solar cells.NiCr is used as diffusion barrier layer between Ag and Al to prevent mutual diffusion,which increases the short circuit current density of solar cell.NiCr and NiCr/Al layers are used as protective layers of Ag layer against oxidation and sulfurization,the higher efficiency of solar cell is achieved.The experimental results show that the performance of a-SiGe solar cell with AZO/Ag/NiCr/Al back reflector is best.The initial conversion efficiency is achieved to be 8.05%.

  10. Fabrication and Characteristics of High Capacitance Al Thin Films Capacitor Using a Polymer Inhibitor Bath in Electroless Plating Process.

    Science.gov (United States)

    Cho, Young-Lae; Lee, Jung-Woo; Lee, Chang-Hyoung; Choi, Hyung-Seon; Kim, Sung-Su; Song, Young Il; Park, Chan; Suh, Su-Jeong

    2015-10-01

    An aluminum (Al) thin film capacitor was fabricated for a high capacitance capacitor using electrochemical etching, barrier-type anodizing, and electroless Ni-P plating. In this study, we focused on the bottom-up filling of Ni-P electrodes on Al2O3/Al with etched tunnels. The Al tunnel pits were irregularly distributed on the Al foil, diameters were in the range of about 0.5~1 μm, the depth of the tunnel pits was approximately 35~40 μm, and the complex structure was made full filled hard metal. To control the plating rate, the experiment was performed by adding polyethyleneimine (PEI, C2H5N), a high molecular substance. PEI forms a cross-link at the etching tunnel inlet, playing the role of delaying the inlet plating. When the PEI solution bath was used after activation, the Ni-P layer was deposited selectively on the bottoms of the tunnels. The characteristics were analyzed by adding the PEI addition quantity rate of 100~600 mg/L into the DI water. The capacitance of the Ni-P/Al2O3 (650~700 nm)/Al film was measured at 1 kHz using an impedance/gain phase analyzer. For the plane film without etch tunnels the capacitance was 12.5 nF/cm2 and for the etch film with Ni-P bottom-up filling the capacitance was 92 nF/cm2. These results illustrate a remarkable maximization of capacitance for thin film metal capacitors.

  11. Ab-initio thermodynamic and elastic properties of AlNi and AlNi3 intermetallic compounds

    Science.gov (United States)

    Yalameha, Shahram; Vaez, Aminollah

    2018-04-01

    In this paper, thermodynamic and elastic properties of the AlNi and AlNi3 were investigated using density functional theory (DFT). The full-potential linearized augmented plane-wave (APW) in the framework of the generalized gradient approximation as used as implemented in the Wien2k package. The temperature dependence of thermal expansion coefficient, bulk modulus and heat capacity in a wide range of temperature (0-1600 K) were investigated. The calculated elastic properties of the compounds show that both intermetallic compounds of AlNi and AlNi3 have surprisingly negative Poisson’s ratio (NPR). The results were compared with other experimental and computational data.

  12. Atomistic simulations of diffusion mechanisms in off-stoichiometric Al-rich Ni3Al

    International Nuclear Information System (INIS)

    Duan, Jinsong

    2007-01-01

    This paper presents dynamics simulation results of diffusion in off-stoichiometric Al-rich Ni 3 Al (Ni 73 Al 27 ) at temperature ranging from 1300 to 1550 K. The interatomic forces are described by the Finnis-Sinclair type N-body potentials. Particular attention is devoted to the effect of the extra 2% of Al atoms sitting on the Ni sublattice as antisite point defects (Al Ni ) on diffusion. Simulation results show that Ni atoms mainly diffuse through the Ni sublattice at the temperatures investigated. Al atoms diffuse via both the intrasublattice and antistructure bridge (ASB) mechanisms. The contribution to Al diffusion from the ASB mechanism decreases at the lower temperature (T Ni ) enhances both Al and Ni diffusion in Ni 73 Al 27 . The Ni-Al coupled diffusion effect is observed and understood at the atomic level for the first time

  13. α-NiPt(Al) and phase equilibria in the Ni-Al-Pt system at 1150 deg C

    International Nuclear Information System (INIS)

    Hayashi, S.; Ford, S.I.; Young, D.J.; Sordelet, D.J.; Besser, M.F.; Gleeson, B.

    2005-01-01

    The α-NiPt(Al) phase and its associated equilibria in the Ni-Al-Pt system at 1150 deg C were investigated by analyzing equilibrated bulk alloys and the interdiffusion zones of diffusion couples. Phase constitutions, tie-lines and microstructures were determined using a combination of techniques, including high-energy synchrotron X-ray diffraction, scanning electron microscopy and electron probe microanalysis. A large Pt solubility limit was found to exist in the β-NiAl, ∼42 at.%, and in γ'-Ni 3 Al, ∼32 at.%. The α-NiPt(Al) phase was found to have wide Pt solubility range of about 33-60 at.% and to skew along an almost constant Pt/Al ratio of 1.5. The α-NiPt(Al) has an ordered face-centered tetragonal L1 0 crystal structure, with the Al and Pt atoms found to be preferentially located in the corners and prismatic faces, respectively. The temperature dependence of the lattice parameters and unit cell volume of the α phase were also determined

  14. Microstructure investigation of NiAl-Cr(Mo) interface in a directionally solidified NiAl-Cr(Mo) eutectic alloyed with refractory metal

    International Nuclear Information System (INIS)

    Chen, Y.X.; Cui, C.Y.; Guo, J.T.; Li, D.X.

    2004-01-01

    The microstructure of a directionally solidified NiAl-Cr(Mo) eutectic alloyed with refractory metal in as-processed and heat-treated states has been studied by means of scanning electron microscopy and high resolution electron microscopy (HREM). The microstructure of the NiAl-Cr(Mo) eutectic was characterized by lamellar Cr(Mo) phases embedded within NiAl matrix with common growth direction of . The interface between NiAl and lamellar Cr(Mo) did not have any transition layers. Misfit dislocations were observed at the NiAl-Cr(Mo) interface. In addition to lamellar Cr(Mo) phases, coherent Cr(Mo, Ni, Al) precipitates and NiAl precipitates were also observed in the NiAl matrix and lamellar Cr(Mo) phases, respectively. After hot isostatic pressing and heat treatment, the NiAl-Cr(Mo) interfaces became smooth and straight. Square array of misfit dislocations was directly observed at the (0 0 1) interface between NiAl and Cr(Mo, Ni, Al) precipitate. The configuration of misfit dislocation network showed a generally good agreement with prediction based on the geometric O-lattice model

  15. Laser alloyed Al-Ni-Fe coatings

    CSIR Research Space (South Africa)

    Pityana, SL

    2008-10-01

    Full Text Available The aim of this work was to produce crack-free thin surface layers consisting of binary (Al-Ni, Al-Fe) and ternary (Al-Ni-Fe) intermetallic phases by means of a high power laser beam. The laser surface alloying was carried out by melting Fe and Ni...

  16. Thermal stability and electrical characteristics of NiSi films with electroplated Ni(W) alloy

    International Nuclear Information System (INIS)

    Xin Yuhang; Hu Anmin; Li Ming; Mao Dali

    2011-01-01

    In this study, an electroplating method to deposited Ni, crystalline NiW(c-NiW), amorphous NiW (a-NiW) films on P-type Si(1 0 0) were used to form Ni-silicide (NiSi) films. After annealed at various temperatures, sheet resistance of Ni/Cu, c-NiW/Cu and a-NiW/Cu was measured to observe the performance of those diffusion barrier layers. With W added in the barrier layer, the barrier performance was improved. The results of XRD and resistance measurement of the stacked Si/Ni(W)/Cu films reveal that Cu atom could diffuse through Ni barrier layer at 450 deg. C, could diffuse through c-NiW at 550 deg. C, but could hardly diffuse through a-NiW barrier layer. c-NiW layer has a better barrier performance than Ni layer, meanwhile the resistance is lower than a-NiW layer.

  17. Microporous Ni@NiO nanoparticles prepared by chemically dealloying Al_3Ni_2@Al nanoparticles as a high microwave absorption material

    International Nuclear Information System (INIS)

    Pang, Yu; Xie, Xiubo; Li, Da; Chou, Wusheng; Liu, Tong

    2017-01-01

    The Al_3Ni_2@Al nanoparticles (NPs) were prepared from Ni_4_5Al_5_5 master alloy by hydrogen plasma-metal reaction method, and were subsequently dealloyed to produce porous Ni@NiO NPs of 36 nm. The pore size ranges from 0.7 to 1.6 nm, leading to large specific surface area of 69.5 m"2/g and big pore volume of 0.507 cc/g. The saturation magnetization (M_S) and coercivity (H_C) of the microporous Ni@NiO NPs are 11.5 emu/g and 5.2 Oe. They exhibit high microwave absorption performance with a minimum reflection coefficient (RC) of −86.9 dB and an absorption bandwidth of 2.6 GHz (RC≤−10 dB) at thickness of 4.5 mm. The enhanced microwave absorption properties are attributed to the synergistic effect of the magnetic Ni core and dielectric NiO shell, and the micropore architecture. The NPs with micropore morphology and core/shell structure open a new way to modify the microwave absorption performance. - Graphical abstract: The microporous Ni/NiO nanoparticles prepared by chemically dealloying Al_3Ni_2@Al NPs exhibit high microwave absorption intensity (−86.9 dB) and wide absorption bandwidth (2.6 GHz for RC≤−10 dB). - Highlights: • Microporous Ni/NiO nanoparticals were prepared by chemically dealloying method. • They possessed micropores of 0.7–1.6 nm with a surface area of 69.5 m"2/g. • They showed high microwave absorption intensity and wide absorption bandwidth. • Microwave absorption mechanism was explained by micropore and core/shell structures.

  18. Magnetic properties of FeNi-based thin film materials with different additives

    KAUST Repository

    Liang, C.; Gooneratne, C.P.; Wang, Q.X.; Liu, Y.; Gianchandani, Y.; Kosel, Jü rgen

    2014-01-01

    This paper presents a study of FeNi-based thin film materials deposited with Mo, Al and B using a co-sputtering process. The existence of soft magnetic properties in combination with strong magneto-mechanical coupling makes these materials

  19. Electrical characterization of Ni/n-ZnO/p-Si/Al heterostructure fabricated by pulsed laser deposition technique

    International Nuclear Information System (INIS)

    Chand, Subhash; Kumar, Rajender

    2014-01-01

    Highlights: • The Ni/n-ZnO/p-Si/Al heterojunction diodes are fabricated by pulsed laser deposition. • The band gap of the deposit ZnO films was found to be 3.43 eV. • Forward I–V data of Ni/n-ZnO/p-Si/Al hetrojunction are interpreted in terms of thermionic emission–diffusion mechanism. • The C–V characteristics of the Ni/n-ZnO/p-Si/Al hetrojunction diode are measured in the temperature range 80–300 K. • The barrier height of Ni/n-ZnO/p-Si/Al hetrojunction diode is also calculated from C–V measurements. - Abstract: The ZnO thin films are grown on the p-Si for the heterojunction fabrication by pulsed laser deposition method. X-ray diffraction study showed that the texture of the film is hexagonal with a strong (0 0 2) plane as preferred direction. High purity vacuum evaporated nickel and aluminum metals were used to make contacts to the n-ZnO and p-Si, respectively. The current–voltage characteristics of Ni/n-ZnO/p-Si(1 0 0)/Al hetero structure measured over the temperature range 80–300 K have been studied on the basis of thermionic emission diffusion mechanism. The equivalent Schottky barrier height and diode ideality factor are determined by fitting of measured current–voltage data in to thermionic diffusion equation. It is observed that the barrier height decreases and the ideality factor increases with decrease of temperature and the activation energy plot exhibit non-linear behavior. These characteristics are attributed to the Gaussian distribution of barrier heights. The capacitance–voltage characteristics of Ni/n-ZnO/p-Si(1 0 0)/Al heterojunction diode are also studied over wide temperature range. From the measured capacitance–voltage data the built in voltage and impurity concentration in n-type ZnO is estimated

  20. Wetting - Dewetting Transitions of Au/Ni Bilayer Films

    Science.gov (United States)

    Cen, Xi

    Thin films deposited at low temperatures are often kinetically constrained and will dewet the underlying substrate when annealed. Solid state dewetting is driven by the minimization of the total free energy of thin film-substrate interface and free surface, and mostly occurs through surface diffusion. Dewetting is a serious concern in microelectronics reliability. However, it can also be utilized for the self-assembly of nanostructures with potentials in storage, catalysis, or transistors. Therefore, a fundamental understanding of the dewetting behavior of thin metal films is critical for improving the thermal stability of microelectronics and controlling the order of self-assembled nanostructures. Mechanisms for dewetting of single layer films have been studied extensively. However little work has been reported on multilayer or alloyed thin films. In the thesis, the solid state dewetting of Au/Ni bilayer films deposited on SiO2/Si substrates was investigated by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and aberration corrected scanning TEM (STEM). Ex-situ SEM and TEM studies were performed with in-situ TEM heating characterization to identify the mechanisms during the dewetting process of Au/Ni bilayer films. The solid state dewetting of Au/Ni bilayer films from SiO2/Si substrates exhibits both homogeneous and localized dewetting of Ni and long-edge retraction for Au under isothermal annealing condition. The top Au layer retracts up to 1 mm from the edge of the substrate wafer to reduce the energetically unfavored Au/Ni interface. In contrast, Ni dewets and agglomerates locally due to its limited diffusivity compared to Au. Film morphology and local chemical composition varies significantly across hundreds of microns along the direction normal to the retracting edge. Besides long range edge receding, localized dewetting shows significant changes in film morphology and chemical distribution. Both Au and Ni shows texturing. Despite

  1. Pd-Ni-MWCNT nanocomposite thin films: preparation and structure

    Science.gov (United States)

    Kozłowski, Mirosław; Czerwosz, ElŻbieta; Sobczak, Kamil

    2017-08-01

    The properties of nanocomposite palladium-nickel-multi-walled (Pd-Ni-MWCNT) films deposited on aluminum oxide (Al2O3) substrate have been prepared and investigated. These films were obtained by 3 step process consisted of PVD/CVD/PVD methods. The morphology and structure of the obtained films were characterized by Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM) techniques at various stages of the film formation. EDX spectrometer was used to measurements of elements segregation in the obtained film. TEM and STEM (Scanning Transmission Electron Microscopy) observations showed MWCNTs decorated with palladium nanoparticles in the film obtained in the last step of film formation (final PVD process). The average size of the palladium nanoparticles observed both on MWCNTs and carbonaceous matrix does not exceed 5 nm. The research was conducted on the use of the obtained films as potential sensors of gases (e.g. H2, NH3, CO2) and bio-sensors or optical sensors.

  2. Glass forming ability of the Al-Ce-Ni system; Avaliacao da capacidade de formacao vitrea do sistema Al-Ce-Ni

    Energy Technology Data Exchange (ETDEWEB)

    Triveno Rios, C. [Engenharia Mecanica, Universidade Federal de Mato Grosso, Rondonopolis, MT (Brazil)], e-mail: triveno@ufmt.br; Surinach, S.; Baro, M.D. [Departamento de Engenharia de Materiais - Universidade Federal de Sao Carlos, SP (Brazil); Bolfarini, C.; Botta, W.J.; Kiminami, C.S. [Departamento de Fisica da Universidade Autonoma de Barcelona, Bellaterra (Spain)

    2010-07-01

    In the present work, the glass forming ability (GFA) and its compositional dependence on Al-Ni-Ce system alloys were investigated in function of several thermal parameters. Rapidly quenched Al{sub 85}Ni{sub 15}-{sub X}Ce{sub X} (X=4,5,6,7,10), Al{sub 90}Ni{sub 5}Ce{sub 5}, Al{sub 89}Ni{sub 2}.{sub 4}Ce{sub 8}.{sub 6}, Al{sub 80}Ni{sub 15.6}Ce{sub 4}.{sub 4} and Al{sub 78}Ni{sub 18.5}Ce{sub 3.5} amorphous ribbons were produced by melt-spinning and the structural transformation during heating was studied using a combination of X-ray diffraction (XRD) and differential scanning calorimetry (DSC). The results showed that the GFA and the thermal stability in the Al-rich corner of Al- Ni-Ce system alloys were enhanced by increasing the solute content and specifically the Ce content (author)

  3. Ductility of Ni3Al doped with substitutional elements

    International Nuclear Information System (INIS)

    Hanada, S.; Chiba, A.; Guo, H.Z.; Watanabe, S.

    1993-01-01

    This paper reports on ductility of B-free Ni 3 Al alloys. Recrystallized Ni 3 Al binary alloys with Ni-rich compositions show appreciable ductility when an environmental effect is eliminated, while the alloys with stoichiometric and Al-rich compositions remain brittle. The ductility in the Ni-rich Ni 3 Al alloys is associated with low ordering energy. The additions of ternary elements, which are classified as γ formers, ductilize ternary Ni 3 Al alloys(Ni-23 at% Al-2 at% X, X = Pd, Pt, Cu and Co), whereas the additions of γ' formers embrittle ternary Ni 3 Al alloys(Ni-23 at% Al-2 at% X, X = Ta, Mo, Nb, Zr, Hf, V, Ti and Si). The additions of small amounts (less than 1 at%) of γ' formers such as Zr and Hf also ductilize as-cast ternary Ni 3 Al alloys. Ductility of Ni 3 Al alloys doped with substitutional elements is discussed in terms of ordering energy and microstructure

  4. Thickness dependent ferromagnetism in thermally decomposed NiO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Ravikumar, Patta; Kisan, Bhagaban; Perumal, Alagarsamy, E-mail: perumal@iitg.ernet.in

    2016-11-15

    We report the effects of film thickness, annealing temperature and annealing environments on thermal decomposition behavior and resulting magnetic properties of NiO (t=50–300 nm) thin films. All the NiO films were prepared directly on thermally oxidized Si at ambient temperature using magnetron sputtering technique and post annealed at different temperatures (T{sub A}) under vacuum and oxygen atmospheres. As-deposited films exhibit face centered cubic structure with large lattice constant due to strain induced during sputtering process. With increasing T{sub A}, the lattice constant decreases due to the release of strain and thickness dependent thermal decomposition reaction of NiO into Ni has been observed for the NiO films annealed at 500 °C under vacuum condition. As a result, the antiferromagnetic nature of the as-deposited NiO films transforms into ferromagnetic one with dominant thickness dependent ferromagnetic behavior at room temperature. In addition, the existence of both Ni and NiO phases in the annealed NiO films shows noticeable exchange bias under field cooling condition. The behavior of thermal decomposition was not observed for the NiO films annealed under oxygen condition which results in no detectable change in the magnetic properties. The observed results are discussed on the basis of thickness dependent thermal decomposition in NiO films with increasing T{sub A} and changing annealing conditions. - Highlights: • Preparation of highly strained single layer NiO films with different thicknesses. • Study the effects of annealing under different environments on crystal structure. • Understanding the origin of thickness dependent thermal decomposition reaction. • Investigate the role of thermal decomposition reaction on the magnetic properties. • Study the interaction between NiO and Ni phases on the exchange bias mechanism.

  5. Ultrathin highly uniform Ni(Al) germanosilicide layer with modulated B8 type Ni5(SiGe)3 phase formed on strained Si1−xGex layers

    International Nuclear Information System (INIS)

    Liu, Linjie; Xu, Dawei; Jin, Lei; Knoll, Lars; Wirths, Stephan; Nichau, Alexander; Buca, Dan; Mussler, Gregor; Holländer, Bernhard; Zhao, Qing-Tai; Mantl, Siegfried; Feng Di, Zeng; Zhang, Miao

    2013-01-01

    We present a method to form ultrathin highly uniform Ni(Al) germanosilicide layers on compressively strained Si 1−x Ge x substrates and their structural characteristics. The uniform Ni(Al) germanosilicide film is formed with Ni/Al alloy at an optimized temperature of 400 °C with an optimized Al atomic content of 20 at. %. We find only two kinds of grains in the layer. Both grains show orthogonal relationship with modified B8 type phase. The growth plane is identified to be (10-10)-type plane. After germanosilicidation the strain in the rest Si 1−x Ge x layer is conserved, which provides a great advantage for device application

  6. Photochemical deposition of NiCoO x thin films from Ni/Co heteronuclear triketonate complexes

    International Nuclear Information System (INIS)

    Buono-Core, G.E.; Tejos, M.; Cabello, G.; Guzman, N.; Hill, R.H.

    2006-01-01

    UV light irradiation of thin films of a polyketonate Ni/Co heteronuclear complex, NiCo(DBA) 2 [DBA, dibenzoylacetone)], spin coated on Si(1 0 0) substrates produced NiCoO x mixed oxides as amorphous films. On annealing at 600 deg. C under air, the mixed oxide film decomposed to NiO and CoO as indicated by XRD measurements. The morphology of the as-deposited films was examined by AFM analysis showing a smooth surface with low rms roughness values. The ratio of Ni/Co (1.08) present in the film reflects the stoichiometry in the starting compound within the experimental error, as shown by XPS analysis. The large amount of carbon (20.8%) detected on the surface of the film may be due to the presence of phenyl rings in the precursor complex

  7. Thin NiTi Films Deposited on Graphene Substrates

    Science.gov (United States)

    Hahn, S.; Schulze, A.; Böhme, M.; Hahn, T.; Wagner, M. F.-X.

    2017-03-01

    We present experimental results on the deposition of Nickel Titanium (NiTi) films on graphene substrates using a PVD magnetron sputter process. Characterization of the 2-4 micron thick NiTi films by electron microscopy, electron backscatter diffraction, and transmission electron microscopy shows that grain size and orientation of the thin NiTi films strongly depend on the type of combination of graphene and copper layers below. Our experimental findings are supported by density functional theory calculations: a theoretical estimation of the binding energies of different NiTi-graphene interfaces is in line with the experimentally determined microstructural features of the functional NiTi top layer.

  8. Structural features in Ni-Al alloys

    International Nuclear Information System (INIS)

    Abylkalykova, R.B.; Kveglis, L.I.; Rakhimova, U.A.; Nasokhova, Sh.B.; Tazhibaeva, G.B.

    2007-01-01

    Purpose of the work is study of structural transformations under diverse memory effect in Ni-Al alloys. Examination were conducted in following composition samples: Ni -75 at.% and Al - 25 at.%. The work is devoted to clarification reasons both formation atom-ordered structures in inter-grain boundaries of bulk samples under temperature action and static load. Revealed inter-grain inter-boundary layers in Ni-Al alloy both bulk and surface state have complicated structure

  9. Physical and mechanical metallurgy of NiAl

    Science.gov (United States)

    Noebe, Ronald D.; Bowman, Randy R.; Nathal, Michael V.

    1994-01-01

    Considerable research has been performed on NiAl over the last decade, with an exponential increase in effort occurring over the last few years. This is due to interest in this material for electronic, catalytic, coating and especially high-temperature structural applications. This report uses this wealth of new information to develop a complete description of the properties and processing of NiAl and NiAl-based materials. Emphasis is placed on the controlling fracture and deformation mechanisms of single and polycrystalline NiAl and its alloys over the entire range of temperatures for which data are available. Creep, fatigue, and environmental resistance of this material are discussed. In addition, issues surrounding alloy design, development of NiAl-based composites, and materials processing are addressed.

  10. In-situ hybrid study of thermal behaviour of Znsbnd Ni and Znsbnd Nisbnd Al2O3 nanocrystallite thin films induced TEA/MEA by electrocodeposition

    Science.gov (United States)

    Abdulwahab, M.; Fayomi, O. S. I.; Popoola, A. P. I.; Dodo, M. R.

    Our present investigation focuses on the thermal stability of already developed electroforms of Znsbnd Ni and Znsbnd Nisbnd Al2O3 thin films induced with triethylamine (TEA) and monoethylamine (MEA) as surfactant by electrocodeposition on mild steel substrate with the aim to re-examine its micro-hardness and degradation behaviour in static sodium chloride solution. In the event, the samples were thermally treated at 200 °C and air cooled. The results obtained showed that the developed composites are thermally stable with hardness value of the Znsbnd Nisbnd Al2O3 coated; 185 Hv increased to 190.5 Hv indicating a 2.89% improvement. Noticeably, in the Znsbnd Ni coatings, a decrease in the hardness with 26.67% was observed. The oxidation resistance was however favored for both composites.

  11. Electrodeposition and characterization of nanocrystalline CoNiFe films

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Y.; Wang, Q.P. [Department of Chemistry, Zhejiang University, Hangzhou, Zhejiang 310027 (China); Cai, C. [School of Chemistry and chemical engineering, Ningxia University, Yinchuan 750021 (China); Yuan, Y.N. [Department of Materials and Chemistry, Zhejiang University, Hangzhou, Zhejiang 310027 (China); Cao, F.H. [Department of Chemistry, Zhejiang University, Hangzhou, Zhejiang 310027 (China); Zhang, Z., E-mail: eaglezzy@zjuem.zju.edu.cn [Department of Chemistry, Zhejiang University, Hangzhou, Zhejiang 310027 (China); Zhang, J.Q. [Department of Chemistry, Zhejiang University, Hangzhou, Zhejiang 310027 (China); State Key Laboratory for Corrosion and Protection of Metals, Shenyang 110016 (China)

    2012-02-29

    Nanocrystalline Co{sub 45}Ni{sub 10}Fe{sub 24} films have been fabricated using cyclic voltammetry technique from the solutions containing sulfate, then characterized by scanning electron microscopy, X-ray diffraction and vibrating sample magnetometer. Meanwhile, Electrochemical Impedance Spectroscopy technique has been employed to probe into the nucleation/growth behavior of Co{sub 45}Ni{sub 10}Fe{sub 24} films. The results show that, the obtained Co{sub 45}Ni{sub 10}Fe{sub 24} film possesses low coercivity of 973.3 A/m and high saturation magnetic flux density of 1.59 Multiplication-Sign 10{sup 5} A/m. Under the experimental conditions, the nucleation/growth process of Co{sub 45}Ni{sub 10}Fe{sub 24} films is mainly under activation control. With the increase of the applied cathodic potential bias, the charge transfer resistance for CoNiFe deposition decreases exponentially. - Highlights: Black-Right-Pointing-Pointer Nanocrystalline Co{sub 45}Ni{sub 10}Fe{sub 24} film is obtained using cyclic voltammetry technique. Black-Right-Pointing-Pointer Nanocrystalline Co{sub 45}Ni{sub 10}Fe{sub 24} possesses low coercivity of 973.3 A/m. Black-Right-Pointing-Pointer Nanocrystalline Co{sub 45}Ni{sub 10}Fe{sub 24} possesses high saturation magnetic flux density. Black-Right-Pointing-Pointer The nucleation/growth process of CoNiFe films is mainly under activation control. Black-Right-Pointing-Pointer The charge transfer resistance for CoNiFe deposition decreases exponentially.

  12. Microporous Ni@NiO nanoparticles prepared by chemically dealloying Al{sub 3}Ni{sub 2}@Al nanoparticles as a high microwave absorption material

    Energy Technology Data Exchange (ETDEWEB)

    Pang, Yu; Xie, Xiubo; Li, Da [Key Laboratory of Aerospace Materials and Performance (Ministry of Education), School of Materials Science and Engineering, Beihang University, No.37 Xueyuan Road, Beijing 100191 (China); Chou, Wusheng [School of Mechanical Engineering and Automation, Beihang University, Beijing 100191 (China); Liu, Tong, E-mail: tongliu@buaa.edu.cn [Key Laboratory of Aerospace Materials and Performance (Ministry of Education), School of Materials Science and Engineering, Beihang University, No.37 Xueyuan Road, Beijing 100191 (China)

    2017-03-15

    The Al{sub 3}Ni{sub 2}@Al nanoparticles (NPs) were prepared from Ni{sub 45}Al{sub 55} master alloy by hydrogen plasma-metal reaction method, and were subsequently dealloyed to produce porous Ni@NiO NPs of 36 nm. The pore size ranges from 0.7 to 1.6 nm, leading to large specific surface area of 69.5 m{sup 2}/g and big pore volume of 0.507 cc/g. The saturation magnetization (M{sub S}) and coercivity (H{sub C}) of the microporous Ni@NiO NPs are 11.5 emu/g and 5.2 Oe. They exhibit high microwave absorption performance with a minimum reflection coefficient (RC) of −86.9 dB and an absorption bandwidth of 2.6 GHz (RC≤−10 dB) at thickness of 4.5 mm. The enhanced microwave absorption properties are attributed to the synergistic effect of the magnetic Ni core and dielectric NiO shell, and the micropore architecture. The NPs with micropore morphology and core/shell structure open a new way to modify the microwave absorption performance. - Graphical abstract: The microporous Ni/NiO nanoparticles prepared by chemically dealloying Al{sub 3}Ni{sub 2}@Al NPs exhibit high microwave absorption intensity (−86.9 dB) and wide absorption bandwidth (2.6 GHz for RC≤−10 dB). - Highlights: • Microporous Ni/NiO nanoparticals were prepared by chemically dealloying method. • They possessed micropores of 0.7–1.6 nm with a surface area of 69.5 m{sup 2}/g. • They showed high microwave absorption intensity and wide absorption bandwidth. • Microwave absorption mechanism was explained by micropore and core/shell structures.

  13. Joining of Ni-TiC FGM and Ni-Al Intermetallics by Centrifugal Combustion Synthesis

    International Nuclear Information System (INIS)

    Ohmi, Tatsuya; Matsuura, Kiyotaka; Iguchi, Manabu; Mizuma, Kiminori

    2008-01-01

    A centrifugal combustion synthesis (CCS) process has been investigated to join a Ni-Al intermetallic compound and a Ni-TiC cermet. The cermet, a tubular graphite mold, and a green compact of reactants consisting of Al, Ni and NiO were set in a centrifugal caster. When the combustion synthesis reaction was induced in the centrifugal force field, a synthesized molten Ni-Al alloy flowed into the graphite mold and joined to the cermet. The soundness of the joint interface depended on the volume percentage of TiC phase in the cermet. A lot of defects were formed near the interface between the Ni-TiC cermet and the cast Ni-Al alloy when the volume percentage of TiC was 50% or higher. For this kind of cermet system, using a functionally graded cermet such as Ni-10 vol.%TiC/Ni-25 vol.%TiC/Ni-50 vol.%TiC overcame this difficulty. The four-point bending strength of the joined specimen consisting of the three-layered FGM cermet and cast Ni-29 mol%Al alloy was 1010 MPa which is close to the result for a Ni-29 mol%Al alloy specimen

  14. Spark-plasma sintering and mechanical property of mechanically alloyed NiAl powder compact and ball-milled (Ni+Al) mixed powder compact

    International Nuclear Information System (INIS)

    Kim, J.S.; Jang, Y.I.; Kwon, Y.S.; Kim, Y.D.; Ahn, I.S.

    2001-01-01

    Mechanically-alloyed NiAl powder and (Ni+Al) powder mixture prepared by ball-milling were sintered by spark-plasma sintering (SPS) process. Densification behavior and mechanical property were determined from the experimental results and analysis such as changes in linear shrinkage, shrinkage rate, microstructure, and phase during sintering process, Vicker's hardness and transverse rupture strength tests. Densification mechanisms for MA-NiAl powder compact and (Ni+Al) powder mixture were different from each other. While the former showed a rapid increase in densification rate only at higher temperature region of 800-900 o C, the latter revealed firstly a rapid increase in densification rate even at low temperature of 300 o C and a subsequent increase up to 500 o C. Densities of both powder compact (MA and mixture) sintered at 1150 o C for 5 min were 98 and above 99 %, respectively. Sintered bodies were composed mainly of NiAl phase with Ni 3 Al as secondary phase for both powders. Sintered body of MA-NiAl powder showed a very fine grain structure. Crystallite size determined by XRD result and the Sherrer's equation was approximately 80 nm. Vicker's hardness for the sintered bodies of (Ni+Al) powder mixture and MA-NiAl powder were 410±12 H v and 555±10 H v , respectively, whereas TRS values 1097±48 MPa and 1393±75 MPa. (author)

  15. Characterization of Al/Ni multilayers and their application in diffusion bonding of TiAl to TiC cermet

    International Nuclear Information System (INIS)

    Cao, J.; Song, X.G.; Wu, L.Z.; Qi, J.L.; Feng, J.C.

    2012-01-01

    The Al/Ni multilayers were characterized and diffusion bonding of TiAl intermetallics to TiC cermets was carried out using the multilayers. The microstructure of Al/Ni multilayers and TiAl/TiC cermet joint was investigated. The layered structures consisting of a Ni 3 (AlTi) layer, a Ni 2 AlTi layer, a (Ni,Al,Ti) layer and a Ni diffusion layer were observed from the interlayer to the TiAl substrate. Only one AlNi 3 layer formed at the multilayer/TiC cermet interface. The reaction behaviour of Al/Ni multilayers was characterized by means of differential scanning calorimeter (DSC) and X-ray diffraction. The initial exothermic peak of the DSC curve was formed due to the formation of Al 3 Ni and Al 3 Ni 2 phases. The reaction sequence of the Al/Ni multilayers was Al 3 NiAl 3 Ni 2 → AlNiAlNi 3 and the final products were AlNi and AlNi 3 phases. The shear strength of the joint was tested and the experimental results suggested that the application of Al/Ni multilayers improved the joining quality. - Highlights: ► Diffusion bonding of TiAl to TiC cermet was realized using Al/Ni multilayer. ► The reaction sequence of the Al/Ni multilayers was Al 3 NiAl 3 Ni 2 → AlNiAlNi 3 . ► The interfacial microstructure of the joint was clarified. ► The application of Al/Ni multilayers improved the joining quality.

  16. The bimodal distribution spin Seebeck effect enhancement in epitaxial Ni0.65Zn0.35Al0.8Fe1.2O4 thin film

    Science.gov (United States)

    Wang, Hua; Hou, Dazhi; Kikkawa, Takashi; Ramos, Rafael; Shen, Ka; Qiu, Zhiyong; Chen, Yao; Umeda, Maki; Shiomi, Yuki; Jin, Xiaofeng; Saitoh, Eiji

    2018-04-01

    The temperature dependence of the spin Seebeck effect (SSE) in epitaxial Ni0.65Zn0.35Al0.8Fe1.2O4 (NZA ferrite) thin film has been investigated systematically. The SSE at high fields shows a bimodal distribution enhancement from 3 K to 300 K and is well fitted with a double-peak Lorentzian function. We speculate the symmetric SSE enhancement in Pt/NZA ferrite bilayer, which is different from the magnon polarons induced asymmetric spikes in the SSE of Pt/YIG [T. Kikkawa et al. Phys. Rev. Lett. 117, 207203 (2016)], may result from the magnon-phonon interactions occurring at the intersections of the quantized magnon and phonon dispersions. The SSE results are helpful for the investigation of the magnon-phonon interaction in the magnetic ultrathin films.

  17. Characterization of Al/Ni multilayers and their application in diffusion bonding of TiAl to TiC cermet

    Energy Technology Data Exchange (ETDEWEB)

    Cao, J., E-mail: cao_jian@hit.edu.cn [State Key Lab of Advanced Welding Production Technology, Harbin Institute of Technology, Harbin, 150001 (China); Center for Composite Materials and Structures, Harbin Institute of Technology, Harbin, 150001 (China); Song, X.G. [State Key Lab of Advanced Welding Production Technology, Harbin Institute of Technology, Harbin, 150001 (China); Wu, L.Z. [Center for Composite Materials and Structures, Harbin Institute of Technology, Harbin, 150001 (China); Qi, J.L.; Feng, J.C. [State Key Lab of Advanced Welding Production Technology, Harbin Institute of Technology, Harbin, 150001 (China)

    2012-02-29

    The Al/Ni multilayers were characterized and diffusion bonding of TiAl intermetallics to TiC cermets was carried out using the multilayers. The microstructure of Al/Ni multilayers and TiAl/TiC cermet joint was investigated. The layered structures consisting of a Ni{sub 3}(AlTi) layer, a Ni{sub 2}AlTi layer, a (Ni,Al,Ti) layer and a Ni diffusion layer were observed from the interlayer to the TiAl substrate. Only one AlNi{sub 3} layer formed at the multilayer/TiC cermet interface. The reaction behaviour of Al/Ni multilayers was characterized by means of differential scanning calorimeter (DSC) and X-ray diffraction. The initial exothermic peak of the DSC curve was formed due to the formation of Al{sub 3}Ni and Al{sub 3}Ni{sub 2} phases. The reaction sequence of the Al/Ni multilayers was Al{sub 3}Ni {yields} Al{sub 3}Ni{sub 2} {yields} AlNi {yields} AlNi{sub 3} and the final products were AlNi and AlNi{sub 3} phases. The shear strength of the joint was tested and the experimental results suggested that the application of Al/Ni multilayers improved the joining quality. - Highlights: Black-Right-Pointing-Pointer Diffusion bonding of TiAl to TiC cermet was realized using Al/Ni multilayer. Black-Right-Pointing-Pointer The reaction sequence of the Al/Ni multilayers was Al{sub 3}Ni {yields} Al{sub 3}Ni{sub 2} {yields} AlNi {yields} AlNi{sub 3}. Black-Right-Pointing-Pointer The interfacial microstructure of the joint was clarified. Black-Right-Pointing-Pointer The application of Al/Ni multilayers improved the joining quality.

  18. Fabrication and application of mesoporous TiO{sub 2} film coated on Al wire by sol-gel method with EISA

    Energy Technology Data Exchange (ETDEWEB)

    Zhao, Linkang; Lu, Jianjun, E-mail: lujianjunktz@tyut.edu.cn

    2017-04-30

    Highlights: • Successfully fabricated mesoporous TiO{sub 2} thin film on Al wire by sol-gel method with EISA. • Ni supported on this film and exhibits good methanation performance. • Investigate the decomposition temperature of template agent F127 in TiO{sub 2} precursor system. - Abstract: Mesoporous TiO{sub 2} film on Al wire was fabricated by sol-gel method with evaporation induced self assembly (EISA) process using F127 as templating agent in the mixed solution of ethanol and Tetra-n-butyl Titanate. The Ni/TiO{sub 2} film catalyst supported on Al wire was prepared by impregnation and the catalytic performance on methanation was carried out in a titanium alloy micro-reactor tube. It was shown that anatase mesoporous TiO{sub 2} film was prepared in this conditions (1 g F127,calcined at 400 °C and aged for 24 h), which has specific surface area of 127 m{sup 2} g{sup −1} and narrow pore size distribution of 5.3 nm. Low calcined temperature (300 °C) cannot transfer film to anatase and decompose F127 completely. Ni/TiO{sub 2} film on Al wire catalyst was proved to be active in CO methanation reaction. And the CO conversion reaches 99% and CH{sub 4} selectivity close is to 80% when the reaction temperature is higher 360 °C.

  19. A dynamical atomic simulation for the Ni-Al Wulff nanoparticle

    International Nuclear Information System (INIS)

    Tang, Jianfeng; Yang, Jianyu

    2013-01-01

    Ni-Al bimetallic nanoparticle structures are studied from a kinetic point of view. The diffusion and growth of Ni (or Al) atoms on Al (or Ni) cores with the Wulff structure are simulated by molecular dynamics and nudged elastic band methods. An analytic embedded atom model is applied to the two metals. The energy barriers of several typical diffusion processes of the adatoms on the nanoparticle surface are calculated. Results show that the incorporation of the Ni atoms into the Al core easily occurs, and the reverse process does not readily proceed. The growth simulations reveal that a better core-shell nanoparticle is obtained when the Al atoms are deposited on the Ni core at lower temperatures, and the deposition of the Ni atoms on the Al core leads to an amorphous surface. - Highlights: • The diffusion barrier of Ni (or Al) on Al (or Ni) Wulff nanoparticle is studied. • Ni atom can diffuse easily into Al core, and Al atom generally segregate on surface. • A core-shell nanoparticle is obtained for the deposition of Al atoms on Ni core. • Amorphous nanoparticle surface is obtained by depositing Ni atoms on Al core

  20. Formation and Yield of Multi-Walled Carbon Nanotubes Synthesized via Chemical Vapour Deposition Routes Using Different Metal-Based Catalysts of FeCoNiAl, CoNiAl and FeNiAl-LDH

    Directory of Open Access Journals (Sweden)

    Mohd Zobir Hussein

    2014-11-01

    Full Text Available Multi-walled carbon nanotubes (MWCNTs were prepared via chemical vapor deposition (CVD using a series of different catalysts, derived from FeCoNiAl, CoNiAl and FeNiAl layered double hydroxides (LDHs. Catalyst-active particles were obtained by calcination of LDHs at 800 °C for 5 h. Nitrogen and hexane were used as the carrier gas and carbon source respectively, for preparation of MWCNTs using CVD methods at 800 °C. MWCNTs were allowed to grow for 30 min on the catalyst spread on an alumina boat in a quartz tube. The materials were subsequently characterized through X-ray diffraction, Fourier transform infrared spectroscopy, surface area analysis, field emission scanning electron microscopy and transmission electron microscopy. It was determined that size and yield of MWCNTs varied depending on the type of LDH catalyst precursor that is used during synthesis. MWCNTs obtained using CoNiAl-LDH as the catalyst precursor showed smaller diameter and higher yield compared to FeCoNiAl and FeNiAl LDHs.

  1. Mechanisms of fatigue in LIGA Ni MEMS thin films

    International Nuclear Information System (INIS)

    Yang, Y.; Imasogie, B.I.; Allameh, S.M.; Boyce, B.; Lian, K.; Lou, J.; Soboyejo, W.O.

    2007-01-01

    This paper presents the results of an experimental study of the mechanisms of fatigue in LIGA Ni micro-electro-mechanical systems (MEMS) thin films with micro-scale columnar and nano-scale equiaxed grains. Stress-life behavior is reported for films with thicknesses of 70 and 270 μm. The stress-life data are compared with previously reported data for Ni MEMS films and bulk Ni. The films with the nano-scale grains (15 nm average grain size) are shown to have higher strength and fatigue resistance (stress-life data) than those with columnar grain structures. The thicker films (with a columnar microstructure) are also shown to have comparable fatigue life to annealed Ni, while the thinner films (with a columnar microstructure) have comparable fatigue life to wrought Ni. The underlying mechanisms of crack nucleation and growth are elucidated via scanning and transmission electron microscopy. These reveal the formation of slip bands and surface oxides and crystallographic surface/sub-surface crack nucleation and growth in the films with the columnar structures. Surface and corner crack nucleations (from pre-existing defects) are observed in the nanostructured films. The implications of the results are discussed for the analyses of fatigue in nickel MEMS structures

  2. Influence of Ni Solute segregation on the intrinsic growth stresses in Cu(Ni) thin films

    International Nuclear Information System (INIS)

    Kaub, T.M.; Felfer, P.; Cairney, J.M.; Thompson, G.B.

    2016-01-01

    Using intrinsic solute segregation in alloys, the compressive stress in a series of Cu(Ni) thin films has been studied. The highest compressive stress was noted in the 5 at.% Ni alloy, with increasing Ni concentration resulting in a subsequent reduction of stress. Atom probe tomography quantified Ni's Gibbsian interfacial excess in the grain boundaries and confirmed that once grain boundary saturation is achieved, the compressive stress was reduced. This letter provides experimental support in elucidating how interfacial segregation of excess adatoms contributes to the post-coalescence compressive stress generation mechanism in thin films. - Graphical abstract: Cu(Ni) film stress relationship with Ni additions. Atom probe characterization confirms solute enrichment in the boundaries, which was linked to stress response.

  3. Predicting glass-forming compositions in the Al-La and Al-La-Ni systems

    International Nuclear Information System (INIS)

    Gargarella, P.; de Oliveira, M.F.; Kiminami, C.S.; Pauly, S.; Kuehn, U.; Bolfarini, C.; Botta, W.J.; Eckert, J.

    2011-01-01

    Research highlights: → The glass-forming ability of the Al-La and Al-La-Ni systems was studied using the λ* and the λ.Δe criteria. → Both criteria predicted with just 1% at. of error the best glass-former verified so far in the Al-La system. → Four new glass-former compositions could be predicted in the Al-La-Ni system using the λ.Δe criterion. → The best glass-former reported so far in the Al-La-Ni system was found. - Abstract: In this work, a criterion considering the topological instability (λ) and the differences in the electronegativity of the constituent elements (Δe) was applied to the Al-La and Al-Ni-La systems in order to predict the best glass-forming compositions. The results were compared with literature data and with our own experimental data for the Al-La-Ni system. The alloy described in the literature as the best glass former in the Al-La system is located near the point with local maximum for the λ.Δe criterion. A good agreement was found between the predictions of the λ.Δe criterion and literature data in the Al-La-Ni system, with the region of the best glass-forming ability (GFA) and largest supercooled liquid region (ΔT x ) coinciding with the best compositional region for amorphization indicated by the λ.Δe criterion. Four new glassy compositions were found in the Al-La-Ni system, with the best predicted composition presenting the best glass-forming ability observed so far for this system. Although the λ.Δe criterion needs further refinements for completely describe the glass-forming ability in the Al-La and Al-La-Ni systems, the results demonstrated that this criterion is a good tool to predict new glass-forming compositions.

  4. Thermal oxidation of Ni films for p-type thin-film transistors

    KAUST Repository

    Jiang, Jie; Wang, Xinghui; Zhang, Qing; Li, Jingqi; Zhang, Xixiang

    2013-01-01

    p-Type nanocrystal NiO-based thin-film transistors (TFTs) are fabricated by simply oxidizing thin Ni films at temperatures as low as 400 °C. The highest field-effect mobility in a linear region and the current on-off ratio are found to be 5.2 cm2 V-1 s-1 and 2.2 × 103, respectively. X-ray diffraction, transmission electron microscopy and electrical performances of the TFTs with "top contact" and "bottom contact" channels suggest that the upper parts of the Ni films are clearly oxidized. In contrast, the lower parts in contact with the gate dielectric are partially oxidized to form a quasi-discontinuous Ni layer, which does not fully shield the gate electric field, but still conduct the source and drain current. This simple method for producing p-type TFTs may be promising for the next-generation oxide-based electronic applications. © 2013 the Owner Societies.

  5. Neutron diffraction determination of atomic mean-square displacements in cubic compounds of Ni-Al and Ni-Al-Cu systems

    International Nuclear Information System (INIS)

    Khidirov, I.; Mukhtarova, N.N.

    2002-01-01

    The atomic mean-square displacements (AMSD) are some of important characteristics of the solid and can be the main information for determination of a number of other characteristics of substances. In the work AMSD is determined for a number of cubic compounds of Ni-Al, Ni-Al-Cu systems immediately from intensities of neutron diffraction maxima. It is shown by the offered method that in all NiAl x and NiAlCu x compounds with the CsCl - type structure AMSD are near each other and they are practically constant. Therefore it is possible to assume that within the homogeneity region of these compounds the interatomic bond forces are changed insignificantly

  6. Effects of Ni vacancy, Ni antisite, Cr and Pt on the third-order elastic constants and mechanical properties of NiAl

    KAUST Repository

    Wu, Shaohua; Wu, Xiaozhi; Wang, Rui; Liu, Qing; Gan, Liyong

    2014-01-01

    Effects of Ni vacancy, Ni antisite in Al sublattice, Cr in Al sublattice, Pt in Ni sublattice on the second-order elastic constants (SOECs) and third-order elastic constants (TOECs) of the B2 NiAl have been investigated using the first-principles methods. Lattice constant and the SOECs of NiAl are in good agreement with the previous results. The brittle/ductile transition map based on Pugh ratio G/B and Cauchy pressure Pc shows that Ni antisite, Cr, Pt and pressure can improve the ductility of NiAl, respectively. Ni vacancy and lower pressure can enhance the Vickers hardness Hv of NiAl. The density of states (DOS) and the charge density difference are also used to analysis the effects of vacancy, Ni antisite, Cr and Pt on the mechanical properties of NiAl, and the results are in consistent with the transition map. © 2014 Elsevier Ltd. All rights reserved.

  7. Effects of Ni vacancy, Ni antisite, Cr and Pt on the third-order elastic constants and mechanical properties of NiAl

    KAUST Repository

    Wu, Shaohua

    2014-12-01

    Effects of Ni vacancy, Ni antisite in Al sublattice, Cr in Al sublattice, Pt in Ni sublattice on the second-order elastic constants (SOECs) and third-order elastic constants (TOECs) of the B2 NiAl have been investigated using the first-principles methods. Lattice constant and the SOECs of NiAl are in good agreement with the previous results. The brittle/ductile transition map based on Pugh ratio G/B and Cauchy pressure Pc shows that Ni antisite, Cr, Pt and pressure can improve the ductility of NiAl, respectively. Ni vacancy and lower pressure can enhance the Vickers hardness Hv of NiAl. The density of states (DOS) and the charge density difference are also used to analysis the effects of vacancy, Ni antisite, Cr and Pt on the mechanical properties of NiAl, and the results are in consistent with the transition map. © 2014 Elsevier Ltd. All rights reserved.

  8. Surface microstructures and corrosion resistance of Ni-Ti-Nb shape memory thin films

    Science.gov (United States)

    Li, Kun; Li, Yan; Huang, Xu; Gibson, Des; Zheng, Yang; Liu, Jiao; Sun, Lu; Fu, Yong Qing

    2017-08-01

    Ni-Ti-Nb and Ni-Ti shape memory thin films were sputter-deposited onto silicon substrates and annealed at 600 °C for crystallization. X-ray diffraction (XRD) measurements indicated that all of the annealed Ni-Ti-Nb films were composed of crystalline Ni-Ti (Nb) and Nb-rich grains. X-ray photoelectron spectroscopy (XPS) tests showed that the surfaces of Ni-Ti-Nb films were covered with Ti oxides, NiO and Nb2O5. The corrosion resistance of the Ni-Ti-Nb films in 3.5 wt.% NaCl solution was investigated using electrochemical tests such as open-circuit potential (OCP) and potentio-dynamic polarization tests. Ni-Ti-Nb films showed higher OCPs, higher corrosion potentials (Ecorr) and lower corrosion current densities (icorr) than the binary Ni-Ti film, which indicated a better corrosion resistance. The reason may be that Nb additions modified the passive layer on the film surface. The OCPs of Ni-Ti-Nb films increased with further Nb additions, whereas no apparent difference of Ecorr and icorr was found among the Ni-Ti-Nb films.

  9. Surface microstructures and corrosion resistance of Ni-Ti-Nb shape memory thin films

    Energy Technology Data Exchange (ETDEWEB)

    Li, Kun [School of Materials Science and Engineering, Beihang University, Beijing 100191 (China); Beijing Key Laboratory for Advanced Functional Materials and Thin Film Technology, Beihang University, Beijing 100191 (China); Faculty of Engineering and Environment, Northumbria University, Newcastle Upon Tyne NE1 8ST (United Kingdom); Li, Yan, E-mail: liyan@buaa.edu.cn [School of Materials Science and Engineering, Beihang University, Beijing 100191 (China); Beijing Key Laboratory for Advanced Functional Materials and Thin Film Technology, Beihang University, Beijing 100191 (China); Huang, Xu [Memry Corporation, Bethel, CT 06801 (United States); Gibson, Des [Institute of Thin Films, Sensors & Imaging, Scottish Universities Physics Alliance, University of the West of Scotland, Paisley PA1 2BE (United Kingdom); Zheng, Yang; Liu, Jiao; Sun, Lu [School of Materials Science and Engineering, Beihang University, Beijing 100191 (China); Beijing Key Laboratory for Advanced Functional Materials and Thin Film Technology, Beihang University, Beijing 100191 (China); Fu, Yong Qing, E-mail: richard.fu@northumbria.ac.uk [Faculty of Engineering and Environment, Northumbria University, Newcastle Upon Tyne NE1 8ST (United Kingdom)

    2017-08-31

    Highlights: • The corrosion resistance of Ni-Ti-Nb shape memory thin films is investigated. • Modified surface oxide layers improve the corrosion resistance of Ni-Ti-Nb films. • Further Nb additions reduce the potential corrosion tendency of the films. - Abstract: Ni-Ti-Nb and Ni-Ti shape memory thin films were sputter-deposited onto silicon substrates and annealed at 600 °C for crystallization. X-ray diffraction (XRD) measurements indicated that all of the annealed Ni-Ti-Nb films were composed of crystalline Ni-Ti (Nb) and Nb-rich grains. X-ray photoelectron spectroscopy (XPS) tests showed that the surfaces of Ni-Ti-Nb films were covered with Ti oxides, NiO and Nb{sub 2}O{sub 5}. The corrosion resistance of the Ni-Ti-Nb films in 3.5 wt.% NaCl solution was investigated using electrochemical tests such as open-circuit potential (OCP) and potentio-dynamic polarization tests. Ni-Ti-Nb films showed higher OCPs, higher corrosion potentials (E{sub corr}) and lower corrosion current densities (i{sub corr}) than the binary Ni-Ti film, which indicated a better corrosion resistance. The reason may be that Nb additions modified the passive layer on the film surface. The OCPs of Ni-Ti-Nb films increased with further Nb additions, whereas no apparent difference of E{sub corr} and i{sub corr} was found among the Ni-Ti-Nb films.

  10. Strain-dependence of the structure and ferroic properties of epitaxial Ni1−xTi1−yO3 thin films grown on sapphire substrates

    International Nuclear Information System (INIS)

    Varga, Tamas; Droubay, Timothy C.; Bowden, Mark E.; Stephens, Sean A.; Manandhar, Sandeep; Shutthanandan, Vaithiyalingam; Colby, Robert J.; Hu, Dehong; Shelton, William A.; Chambers, Scott A.

    2015-01-01

    Polarization-induced weak ferromagnetism has been predicted a few years back in compounds MTiO 3 (M = Fe, Mn, Ni) (Fennie, 2008). We set out to stabilize this metastable, distorted perovskite structure by growing NiTiO 3 epitaxially on sapphire Al 2 O 3 (001) substrate, and to control the polar and magnetic properties via strain. Epitaxial Ni 1−x Ti 1−y O 3 films of different Ni/Ti ratios and thicknesses were deposited on Al 2 O 3 substrates by pulsed laser deposition at different temperatures, and characterized using several techniques. The effect of film thickness, deposition temperature, and film stoichiometry on lattice strain, film structure, and physical properties was investigated. Our structural data from x-ray diffraction, electron microscopy, and x-ray absorption spectroscopy shows that substrate-induced strain has a marked effect on the structure and crystalline quality of the films. Physical property measurements reveal a dependence of the Néel transition and lattice polarization on strain, and highlight our ability to control the ferroic properties in NiTiO 3 thin films by film stoichiometry and thickness. - Highlights: • NiTiO 3 epitaxial thin films with LiNbO 3 -type structure by pulsed laser deposition. • Strain varied by film thickness, stoichiometry, and synthesis temperature. • Systematic study of the effect of strain on film structure and physical properties. • Manipulation of ferroic properties by strain confirmed

  11. First-principles investigations of Ni3Al(111) and NiAl(110) surfaces at metal dusting conditions

    DEFF Research Database (Denmark)

    Saadi, Souheil; Hinnemann, Berit; Appel, Charlotte C.

    2011-01-01

    We investigate the structure and surface composition of the γ′-Ni3Al(111) and β-NiAl(110) alloy surfaces at conditions relevant for metal dusting corrosion related to catalytic steam reforming of natural gas. In regular service as protective coatings, nickel–aluminum alloys are protected...... by an oxide scale, but in case of oxide scale spallation, the alloy surface may be directly exposed to the reactive gas environment and vulnerable to metal dusting. By means of density functional theory and thermochemical calculations for both the Ni3Al and NiAl surfaces, the conditions under which CO and OH...... adsorption is to be expected and under which it is inhibited, are mapped out. Because CO and OH are regarded as precursors for nucleating graphite or oxide on the surfaces, phase diagrams for the surfaces provide a simple description of their stability. Specifically, this study shows how the CO and OH...

  12. Microstructure evolution of a dissimilar junction interface between an Al sheet and a Ni-coated Cu sheet joined by magnetic pulse welding

    Energy Technology Data Exchange (ETDEWEB)

    Itoi, Takaomi, E-mail: itoi@faculty.chiba-u.jp [Department of Mechanical Engineering, Chiba University, 1-33, Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Mohamad, Azizan Bin; Suzuki, Ryo [Department of Mechanical Engineering, Chiba University, 1-33, Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Okagawa, Keigo [Department of Electrical and Electronics Engineering, Tokyo Metropolitan College of Industrial Technology, 1-10-40 Higashi ohi, Shinagawa-ku, Tokyo 140-0011 (Japan)

    2016-08-15

    An Al sheet and a Ni-coated Cu sheet were lap joined by using magnetic pulse welding (MPW). Tensile tests were performed on the joined sheets, and a good lap joint was achieved at a discharge energy of > 0.9 kJ. The weld interface exhibited a wavy morphology and an intermediate layer along the weld interface. Microstructure observations of the intermediate layer revealed that the Ni coating region consisted of a Ni–Al binary amorphous alloy and that the Al sheet region contained very fine Al nanograins. Ni fragments indicative of unmelted residual Ni from the coating were also observed in parts of the intermediate layer. Formation of these features can be attributed to localize melting and a subsequent high rate cooling of molten Al and Ni confined to the interface during the MPW process. In the absence of an oxide film, atomic-scale bonding was also achieved between the intermediate layer and the sheet surfaces after the collision. MPW utilises impact energy, which affects the sheet surfaces. From the obtained results, good lap joint is attributed to an increased contact area, the anchor effect, work hardening, the absence of an oxide film, and suppressed formation of intermetallic compounds at the interface. - Highlights: •Good lap joint of an Al sheet and a Ni-coated Cu sheet was achieved by using magnetic pulse welding. •A Ni–Al binary amorphous alloy was formed as an intermediate layer at weld interface. •Atomic-scale bonding was achieved between the intermediate layer and the sheet surfaces.

  13. C-Ni-Pd and CNT-Ni-Pd film's molecular and crystalline structure investigations by FTIR spectroscopy and XRD diffraction

    Science.gov (United States)

    Stepińska, Izabela; Czerwosz, ElŻbieta; Diduszko, Ryszard; Kozłowski, Mirosław; Wronka, Halina

    2017-08-01

    In this work molecular and crystalline structure of new type of nanocomposite films were investigated. These films compose of CNT decorated with palladium nanograins. They were prepared on a base of C-Ni films modified in CVD process. C-Ni nanocomposite films were obtained by PVD process and their modification by CVD leads to a growth of CNT film. CNTs-Ni or C-Ni films were treated with additional PVD process with palladium. Nickel and palladium acetate and fulleren C60 are precursors of films in PVD process. FTIR spectroscopy was used to studied the molecular structure of film in every stage of preparation . The crystalline structure of these films was studied by X-ray diffraction. SEM (scanning electron microscopy) was applied to investigate film's surface topography.

  14. Photosensitive and temperature-dependent I–V characteristics of p-NiO film/n-ZnO nanorod array heterojunction diode

    Energy Technology Data Exchange (ETDEWEB)

    Long, Hao; Ai, Lei [Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education of China, Department of Electronic Science and Technology, School of Physics and Technology, Wuhan University, Wuhan, Hubei 430072 (China); Li, Songzhan [Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education of China, Department of Electronic Science and Technology, School of Physics and Technology, Wuhan University, Wuhan, Hubei 430072 (China); School of Electronic and Electrical Engineering, Wuhan Textile University, Wuhan, Hubei 430073 (China); Huang, Huihui; Mo, Xiaoming; Wang, Haoning; Chen, Zhao; Liu, Yuping [Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education of China, Department of Electronic Science and Technology, School of Physics and Technology, Wuhan University, Wuhan, Hubei 430072 (China); Fang, Guojia, E-mail: gjfang@whu.edu.cn [Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education of China, Department of Electronic Science and Technology, School of Physics and Technology, Wuhan University, Wuhan, Hubei 430072 (China)

    2014-05-01

    Highlights: • A p-NiO film/n-ZnO nanorod array heterojunction was prepared. • The heterojunction shows good morphology and crystal properties. • The diode exhibits excellent rectifying behavior. • The diode exhibits strong temperature dependent I–V properties. • The hybrid diode shows good photosensitivity under the ultraviolet irradiation. - Abstract: A p-NiO film/n-ZnO nanorod (NR) array heterojunction was prepared by deposition of NiO film on ZnO NRs using radio-frequency reactive magnetron sputtering. The well-aligned ZnO NRs were fabricated by a simple and economic hydrothermal method on a ZnO:Al-coated glass substrate. Good morphology and crystal properties of the fabricated ZnO NRs and NiO film were confirmed by scanning electron microscopy and X-ray diffraction. The p–n heterojunction exhibits excellent rectifying behaviour and strong temperature-dependent current–voltage properties in the range from −50 to 80 °C. The hybrid NR heterojunction diode shows good photosensitivity under the irradiation of 365 nm ultraviolet light. These results present potential applications in future microelectronic devices based on NiO films and the one-dimensional ZnO nanomaterials.

  15. Electrodeposited Ni-W magnetic thin films with columnar nanocrystallites

    International Nuclear Information System (INIS)

    Sulitanu, N.; Brinza, F.

    2002-01-01

    Nanocrystalline Ni-W thin films (140 nm) containing from zero to 18 wt % W were electrolytically prepared and structural and magnetic characterized. XRD, SEM and TEM investigations have revealed that all segregated Ni columns are fcc-type whose [111] axis is oriented perpendicular to the film plane and have 140 nm in height and 6-27 nm in diameter. Depending on film composition, two types of nanostructures were observed: (a) single-phase nanostructure ( i nterphases , namely W enriched particles boundaries, and (b) two-phase nanostructure (7-18 wt %) in which a second Ni-W amorphous phase or even amorphous-disordered mixture separates the magnetic columnar Ni nanocrystallites (d = 6-14 nm). The columnar crystallites have an easy magnetization direction along their long axis mainly due to the in-plane internal biaxial stresses. Magnetic characteristics of prepared thin films are presented. (Authors)

  16. Electronic excitation-induced structural, optical, and magnetic properties of Ni-doped HoFeO3 thin films

    International Nuclear Information System (INIS)

    Habib, Zubida; Ikram, Mohd; Mir, Sajad A.; Sultan, Khalid; Abida; Majid, Kowsar; Asokan, K.

    2017-01-01

    Present study investigates the electronic excitation-induced modifications in the structural, optical, and magnetic properties of Ni-doped HoFeO 3 thin films grown by pulsed laser deposition on LaAlO 3 substrates. Electronic excitations were induced by 200 MeV Ag 12+ ion beam. These thin films were then characterized using X-ray diffraction (XRD), atomic force microscopy (AFM), UV-Vis spectroscopy, and magnetic measurements. X-ray diffraction analysis confirms that the crystallite growth occurs in the preferred (111) orientation with orthorhombic structure. The XRD results also show that the crystallite size decreases with ion irradiation. AFM results after irradiation show significant changes in the surface roughness and morphology of these films. The optical parameters measured from absorption measurements reveal reduction in the band gap with Ni doping and enhancement of band gap after irradiation. The magnetization vs field measurement at 75 K shows enhancement in saturation magnetization after irradiation for HoFe 1-x Ni x O 3 (x = 0.1 and 0.3) films compared to HoFeO 3 film. Present study shows electronic excitation induces significant changes in the physical properties of these films. (orig.)

  17. RF magnetron sputtered TiNiCu shape memory alloy thin film

    International Nuclear Information System (INIS)

    Fu Yongqing; Du Hejun

    2003-01-01

    Shape memory alloys (SMAs) offer a unique combination of novel properties, such as shape memory effect, super-elasticity, biocompatibility and high damping capacity, and thin film SMAs have the potential to become a primary actuating mechanism for micro-actuators. In this study, TiNiCu films were successfully prepared by mix sputtering of a Ti 55 Ni 45 target with a separated Cu target. Crystalline structure, residual stress and phase transformation properties of the TiNiCu films were investigated using X-ray diffraction (XRD), differential scanning calorimeter (DSC), and curvature measurement methods. Effects of the processing parameters on the film composition, phase transformation and shape-memory effects were analyzed. Results showed that films prepared at a high Ar gas pressure exhibited a columnar structure, while films deposited at a low Ar gas pressure showed smooth and featureless structure. Chemical composition of TiNiCu thin films was dependent on the DC power of copper target. DSC, XRD and curvature measurement revealed clearly the martensitic transformation of the deposited TiNiCu films. When the free-standing film was heated and cooled, a 'two-way' shape-memory effect can be clearly observed

  18. Electronic bipolar resistive switching behavior in Ni/VOx/Al device

    Energy Technology Data Exchange (ETDEWEB)

    Xia, Mengseng [School of Electronic Information Engineering, Hebei University of Technology, Tianjin Key Laboratory of Electronic Materials and Devices, Tianjin 300130 (China); School of Electronic Information Engineering, Tianjin Key Laboratory of Film Electronic & Communication Devices, Tianjin University of Technology, Tianjin 300384 (China); Zhang, Kailiang, E-mail: kailiang_zhang@163.com [School of Electronic Information Engineering, Tianjin Key Laboratory of Film Electronic & Communication Devices, Tianjin University of Technology, Tianjin 300384 (China); Yang, Ruixia, E-mail: yangrx@hebut.edu.cn [School of Electronic Information Engineering, Hebei University of Technology, Tianjin Key Laboratory of Electronic Materials and Devices, Tianjin 300130 (China); Wang, Fang; Zhang, Zhichao; Wu, Shijian [School of Electronic Information Engineering, Tianjin Key Laboratory of Film Electronic & Communication Devices, Tianjin University of Technology, Tianjin 300384 (China)

    2017-07-15

    Highlights: • The resistive random access memory of Ni/VOx/Al was fabricated. • The device has the electronic bipolar resistive switching characteristic. • The activity energy (Ea) of HRS has been calculated. • The reasons of the degradation of the resistance ratio of HRS/LRS were analyzed. - Abstract: In this paper, the Ni/VOx/Al resistive random access memory (RRAM) device is constructed and it shows bipolar resistive switching behavior, low resistive state (LRS) nonlinearity, and good retention. The set and reset processes are likely induced by the electron trapping and detrapping of trapping centers in the VOx films, respectively. The conduction mechanism in negative/positive region are controlled by space charge limited current mechanism (SCLC)/Schottky emission. The temperature dependence of I–V curves for HRS is measured to confirm the defects trapping and detrapping electrons model. activation energy was calculated to analyze the endurance performance of the device. The detailed analysis of the switching behavior with SCLC mechanism and Schottky emission mechanism could provide useful information for electronic bipolar resistive switching (eBRS) characteristics.

  19. Electronic bipolar resistive switching behavior in Ni/VOx/Al device

    International Nuclear Information System (INIS)

    Xia, Mengseng; Zhang, Kailiang; Yang, Ruixia; Wang, Fang; Zhang, Zhichao; Wu, Shijian

    2017-01-01

    Highlights: • The resistive random access memory of Ni/VOx/Al was fabricated. • The device has the electronic bipolar resistive switching characteristic. • The activity energy (Ea) of HRS has been calculated. • The reasons of the degradation of the resistance ratio of HRS/LRS were analyzed. - Abstract: In this paper, the Ni/VOx/Al resistive random access memory (RRAM) device is constructed and it shows bipolar resistive switching behavior, low resistive state (LRS) nonlinearity, and good retention. The set and reset processes are likely induced by the electron trapping and detrapping of trapping centers in the VOx films, respectively. The conduction mechanism in negative/positive region are controlled by space charge limited current mechanism (SCLC)/Schottky emission. The temperature dependence of I–V curves for HRS is measured to confirm the defects trapping and detrapping electrons model. activation energy was calculated to analyze the endurance performance of the device. The detailed analysis of the switching behavior with SCLC mechanism and Schottky emission mechanism could provide useful information for electronic bipolar resistive switching (eBRS) characteristics.

  20. Study and development of NiAl intermetallic coating on hypo-eutectoid steel using highly activated composite granules of the Ni-Al system

    Energy Technology Data Exchange (ETDEWEB)

    Shahzad, Aamir; Zadorozhnyy, Vladislav Yu.; Pavlov, Mikhail D.; Semenov, Dmitri V.; Kaloshkin, Sergey D. [National Univ. of Science and Technology (MISIS), Moscow (Russian Federation)

    2018-01-15

    NiAl intermetallic coating thickness of about 50 μm was fabricated on hypo-eutectoid steel by mechanical alloying using pre-activated Ni-Al composite granules as coating material. First, Ni and Al powders were mixed with the composition of Ni-50 at.% Al and mechanically activated in a planetary ball mill, until the composite granules of this powder mixture, having maximum activity (9 cm sec{sup -1}), were formed after 120 min of milling at 200 rpm. The composite granules were then taken out from the planetary ball mill just before the critical time, i. e. the time at which these granules synthesize and convert to an intermetallic NiAl compound. The highly activated composite granules of Ni-Al were then put into the vial of a vibratory ball mill with the substrate on top of the chamber. After mechanical alloying for 60 min in the vibratory ball mill, the composite granules were synthesized fully and heat was produced during the synthesis which helped producing a thick and strong adhesive coating of NiAl intermetallic on the steel substrate. The main advantage of this technique is that not only is time saved but also there is no need for any post mechanical alloying process such as annealing or laser treatment etc. to get homogeneous, strongly bonded intermetallic coatings. X-ray diffraction analysis clearly indicates the formation of NiAl phase. Micro-hardness of the coating and substrate was also measured. The cross-sectional microstructure of the composite granules and the final coating were studied by scanning electron microscopy.

  1. Microstructural investigations of Ni and Ni2Al3 coatings exposed in biomass power plants

    DEFF Research Database (Denmark)

    Wu, D. L.; Dahl, K. V.; Christiansen, T. L.

    2018-01-01

    The present work investigates the corrosion resistance of Ni and Ni2Al3 coated austenitic stainless steel (TP347H) tubes, which were exposed in a biomass-fired boiler with an outlet steam temperature of 540 °C for 6757 h. The Ni2Al3 coating was produced by electroplating Ni followed by low...... temperature pack cementation. After exposure, microstructural investigations were performed by light optical and electron microscopy (SEM-EDS). Electroplated Ni coatings were not protective in straw firing power plants and exhibited similar corrosion morphology as uncoated tubes. For Ni2Al3 coatings...

  2. Adsorption properties of Mg-Al layered double hydroxides thin films grown by laser based techniques

    Energy Technology Data Exchange (ETDEWEB)

    Matei, A., E-mail: andreeapurice@nipne.ro [National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., 77125 Bucharest, Magurele (Romania); Birjega, R.; Vlad, A.; Filipescu, M.; Nedelcea, A.; Luculescu, C. [National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., 77125 Bucharest, Magurele (Romania); Zavoianu, R.; Pavel, O.D. [University of Bucharest, Faculty of Chemistry, Department of Chemical Technology and Catalysis, 4-12 Regina Elisabeta Bd., Bucharest (Romania); Dinescu, M. [National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., 77125 Bucharest, Magurele (Romania)

    2012-09-15

    Highlights: Black-Right-Pointing-Pointer Laser techniques MAPLE and PLD can successfully be used to produce LDHs thin films. Black-Right-Pointing-Pointer Hydration treatments of the PLD and MAPLE deposited films lead to the LDH reconstruction effect. Black-Right-Pointing-Pointer The Ni retention from aqueous solution occurs in the films via a dissolution-reconstruction mechanism. Black-Right-Pointing-Pointer The films are suitable for applications in remediation of contaminated drinking water or waste waters. - Abstract: Powdered layered double hydroxides (LDHs) have been widely studied due to their applications as catalysts, anionic exchangers or host materials for inorganic and/or organic molecules. Assembling nano-sized LDHs onto flat solid substrates forming thin films is an expanding area of research due to the prospects of novel applications as sensors, corrosion-resistant coatings, components in optical and magnetic devices. Continuous and adherent thin films were grown by laser techniques (pulsed laser deposition - PLD and matrix assisted pulsed laser evaporation - MAPLE) starting from targets of Mg-Al LDHs. The capacity of the grown thin films to retain a metal (Ni) from contaminated water has been also explored. The thin films were immersed in an Ni(NO{sub 3}){sub 2} aqueous solutions with Ni concentrations of 10{sup -3}% (w/w) (1 g/L) and 10{sup -4}% (w/w) (0.1 g/L), respectively. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) combined with energy dispersive X-ray analysis (EDX) were the techniques used to characterize the prepared materials.

  3. Grain boundaries in Ni3Al. 2

    International Nuclear Information System (INIS)

    Kung, H.; Sass, S.L.

    1992-01-01

    This paper discusses the dislocation structure of small angle tilt and twist boundaries in ordered Ni 3 Al, with and without boron, investigated using transmission electron microscopy. Dislocation with Burgers vectors that correspond to anti-phase boundary (APB)-coupled superpartials were found in small angle twist boundaries in both boron-free and boron-doped Ni 3 Al, and a small angle tilt boundary in boron-doped Ni 3 Al. The boundary structures are in agreement with theoretical models proposed by Marcinkowski and co-workers. The APB energy determined from the dissociation of the grain boundary dislocations was lower than values reported for isolated APBs in Ni 3 Al. For small angle twist boundaries the presence of boron reduced the APB energy at the interface until it approached zero. This is consistent with the structure of these boundaries containing small regions of increased compositional disorder in the first atomic plane next to the interface

  4. Thickness engineering of atomic layer deposited Al2O3 films to suppress interfacial reaction and diffusion of Ni/Au gate metal in AlGaN/GaN HEMTs up to 600 °C in air

    Science.gov (United States)

    Suria, Ateeq J.; Yalamarthy, Ananth Saran; Heuser, Thomas A.; Bruefach, Alexandra; Chapin, Caitlin A.; So, Hongyun; Senesky, Debbie G.

    2017-06-01

    In this paper, we describe the use of 50 nm atomic layer deposited (ALD) Al2O3 to suppress the interfacial reaction and inter-diffusion between the gate metal and semiconductor interface, to extend the operation limit up to 600 °C in air. Suppression of diffusion is verified through Auger electron spectroscopy (AES) depth profiling and X-ray diffraction (XRD) and is further supported with electrical characterization. An ALD Al2O3 thin film (10 nm and 50 nm), which functions as a dielectric layer, was inserted between the gate metal (Ni/Au) and heterostructure-based semiconductor material (AlGaN/GaN) to form a metal-insulator-semiconductor high electron mobility transistor (MIS-HEMT). This extended the 50 nm ALD Al2O3 MIS-HEMT (50-MIS) current-voltage (Ids-Vds) and gate leakage (Ig,leakage) characteristics up to 600 °C. Both, the 10 nm ALD Al2O3 MIS-HEMT (10-MIS) and HEMT, failed above 350 °C, as evidenced by a sudden increase of approximately 50 times and 5.3 × 106 times in Ig,leakage, respectively. AES on the HEMT revealed the formation of a Ni-Au alloy and Ni present in the active region. Additionally, XRD showed existence of metal gallides in the HEMT. The 50-MIS enables the operation of AlGaN/GaN based electronics in oxidizing high-temperature environments, by suppressing interfacial reaction and inter-diffusion of the gate metal with the semiconductor.

  5. Study of the magnetic anisotropy in Ni/Cu and Ni/glass thin films

    International Nuclear Information System (INIS)

    Cherif, S.-M.; Layadi, A.; Ben Youssef, J.; Nacereddine, C.; Roussigne, Y.

    2007-01-01

    The magnetic properties of evaporated Ni/Cu and Ni/glass thin films have been investigated by means of the vibrating sample magnetometer (VSM), the Brillouin light scattering (BLS) and magnetic force microscopy (MFM). The Ni thickness, t, ranges from 31 to 165 nm. The second- and fourth-order magnetic anisotropy constants, K 1 and K 2 , have been included; for the Ni/Cu series, K 1 was found to decrease from 1.0x10 6 to 0.18x10 6 erg/cm 3 as t increases from 31 to 165 nm, while K 2 increased from 0.24x10 6 to 0.8x10 6 erg/cm 3 . Over all the thickness range, the magnetization easy axis is in plane. For thinner films, there is a good agreement between anisotropy constant values inferred from VSM and BLS. Stripe domains were observed for t≥165 nm in Ni/glass and t≥90 nm in Ni/Cu

  6. Investigation of coercivity for electroplated Fe-Ni thick films

    Science.gov (United States)

    Yanai, T.; Eguchi, K.; Koda, K.; Kaji, J.; Aramaki, H.; Takashima, K.; Nakano, M.; Fukunaga, H.

    2018-05-01

    We have already reported Fe-Ni firms with good soft magnetic properties prepared by using an electroplating method. In our previous studies, we prepared the Fe-Ni films from citric-acid-based baths (CA-baths) and ammonium-chloride-based ones (AC-baths), and confirmed that the coercivity for the AC-baths was lower than that for the CA-baths. In the present study, we investigated reasons for the lower coercivity for the AC-baths to further improve the soft magnetic properties. From an observation of magnetic domains of the Fe22Ni78 films, we found that Fe22Ni78 film for AC-bath had a magnetic anisotropy in the width direction, and also found that the coercivity in the width direction was lower than the longitudinal one for the AC-bath. As an annealing for a stress relaxation in the films reduced the difference in the coercivity, we considered that the anisotropy is attributed to the magneto-elastic effect.

  7. Resistance pressure sensor based on Ag/Cu/sub 2/O-PEPC-NiPc/Al composite

    International Nuclear Information System (INIS)

    Khan, A.; Karimov, K.S.; Shah, M.

    2011-01-01

    This work reports on the fabrication and investigation of pressure sensor based on Ag/Cu/sub 2/O-PEPC-NiPc/Al composite. The active layer of the composite was deposited by drop-casting of the blend Cu/sub 2/O-PEPC-NiPc on flexible substrate. The thin film of the blend consist of cuprous oxide (Cu/sub 2/O) micropowder, (5 wt. %), poly-N-epoxypropyl carbazole (PEPC), (2 wt. %) and nickel phthalocyanine (NiPc) micropowder, (3 wt. %) in benzol (1 ml). The film thickness of the composite is in the range of 20-30 mu m. It is found that the fabricated sensor is sensitive to pressure and showed good repeatability. The decrease in resistance of the sensor is observed 10 times by increasing the external uniaxial pressure up to 11.7 kNm/sup -2/. The experimentally obtained results are compared with the simulated results and showed reasonable agreement with each other. (author)

  8. Interplay of structural instability and lattice dynamics in Ni{sub 2}MnAl shape memory alloys

    Energy Technology Data Exchange (ETDEWEB)

    Mehaddene, T.

    2007-02-12

    The work presented here is devoted to investigate the interplay of lattice dynamics and structural instability in Ni{sub 2}MnAl shape memory alloys. Inelastic neutron scattering is used to get more insight on the dynamic precursors of structural instability in Ni{sub 2}MnAl. Differential Scanning Calorimetry was used to characterise the martensitic transition in Ni{sub 2}MnAl alloys. Effects of composition and heat treatments have been investigated. The measured martensitic transition temperature in Ni-Mn-Al alloys depends linearly on the valence electron concentration. Two single crystals with different compositions have been succesfully grown using the Czochralski technique. Acoustic and optical phonon modes have been measured at room temperature in the high symmetry directions of the cubic B2 phase. The force constants have been fitted to the measured data using the Born-von Karman model. The character of the phonon softening measured in Ni{sub 2}MnAl corresponds to the pattern of atomic displacements of the modulations 2M, 10M, 12M and 14M observed in bulk and thin-films of Ni{sub 2}MnAl. The effect of the composition on the lattice instability has been investigated by measuring normal modes of vibration in two different crystals, Ni{sub 51}Mn{sub 18}Al{sub 31} and Ni{sub 53}Mn{sub 22}Al{sub 25}, with e/a ratios of 7.29 and 7.59 respectively. The stabilisation of a single L2{sub 1} phase in Ni{sub 2}MnAl by annealing a Ni{sub 51}Mn{sub 18}Al{sub 31} single crystal at 673 K during 45 days has been attempted. Despite of the long-time annealing, a single L2{sub 1} phase could not be stabilised because of either a slow diffusion kinetics or the establishment of an equilibrium between the L2{sub 1} and the B2 phases. Phonon measurements of the TA{sub 2}[{xi}{xi}0] branch in the annealed sample revealed a substantial effect. The wiggle, associated with the anomalous softening, is still present but the degree of softening is smaller below 673 K and changes

  9. Thin films on icosahedral AlPdMn quasicrystal

    Energy Technology Data Exchange (ETDEWEB)

    Longchamp, J.N.

    2007-07-01

    In this project, the oxidation at high temperature of the fivefold-symmetry surface of an icosahedral Al{sub 70}Pd{sub 20}M{sub 10} quasicrystal was principally investigated. The stoichiometry of the near-surface region was investigated by means of Auger electron spectroscopy and X-ray photoelectron spectroscopy and both confirmed the oxidation of only the Al atoms of the quasicrystalline substrate. The affinity of the two structures is illustrated by the CsCl-like AlPd domains observed, by means of secondary-electron imaging, after Ar{sup +}-sputtering of the quasicrystalline surface. In this project, we used the oxidized fivefold-symmetry surface of i-AlPdMn as substrate for the deposition of PbTe and CdTe. Diffraction patterns obtained from thin films of both materials exhibit, instead of the usual spots, diffraction rings. They are characteristics of nanocrystallites having a random azimuthal orientations but a well-defined polar orientation; the (001) face and the (111) face in case of PbTe and CdTe, respectively. From the diffraction patterns, average domain sizes of 35 Aa were deduced. Face-centered-cubic Al(111) domains with a similar average size are observed in this case. Angle-resolved photoemission spectroscopy investigations on the PbTe films were performed. We also performed angle-resolved photoemission spectroscopy measurements on Ag films deposited onto the fivefold-symmetry surface of icosahedral AlPdMn and onto the tenfold-symmetry surface of decagonal AlCoNi as model for confinement effects occurring due to the incompatible symmetries between the crystalline films and the quasicrystalline surfaces. By analyzing the Ag sp-derived quantum-well states, we assert that the interface with the quasiperiodic material constitutes an efficient barrier for electron propagation, due to lack of common point-group symmetries between Bloch-like and critical wave functions. Finally, the depositions of Si and Ge onto the fivefold-symmetry surface of icosahedral

  10. Surface and interface analysis of PVD Al-O-N and {gamma}-Al{sub 2}O{sub 3} diffusion barriers

    Energy Technology Data Exchange (ETDEWEB)

    Cremer, R.; Witthaut, M.; Reichert, K.; Neuschuetz, D. [Technische Hochschule Aachen (Germany). Lehrstuhl fuer Metallurgie der Kernbrennstoffe und Theoretische Huettenkunde

    1999-10-01

    The suitability of PVD films of {gamma}-Al{sub 2}O{sub 3} and of ternary Al-O-N as diffusion barriers between a nickel based superalloy CMSX-4 and NiCoCrAlY for a possible application in gas turbines was investigated. Therefore, an Al{sub 2}O{sub 3} film and, alternatively, an Al-O-N film were deposited on CMSX-4 at 100 C substrate temperature by means of reactive magnetron sputtering ion plating (MSIP). After characterization of composition and structure of the films by X-ray photoelectron spectroscopy (XPS) and grazing incidence X-ray diffraction (XRD), a NiCoCrAlY coating was deposited onto the diffusion barriers and, for comparison, directly onto CMSX-4 by MSIP as well. The composites were annealed for 4 h at 1100 C under inert atmosphere. Wavelength dispersive X-ray (WDX) element mappings and line-scans of the cross-sectional cut served to evaluate the suitability of the films as diffusion barriers. After detachment of the coatings from the substrate, the phase stabilities of the two metastable phases {gamma}-Al{sub 2}O{sub 3} and Al-O-N were determined by means of grazing incidence XRD. Without a diffusion barrier, enhanced interdiffusion was observed. Analyses of the composite with the {gamma}-Al{sub 2}O{sub 3} interlayer revealed diffusion of Ti and Ta from the substrate into the NiCoCrAlY coating. No interdiffusion of Ni, Ti, Ta, and Cr could be detected in case of the ternary Al-O-N film. Whereas the ternary Al-O-N film remained in the as-deposited X-ray amorphous structure after annealing, a phase change from the {gamma} to the {alpha} modification could be observed in case of the Al{sub 2}O{sub 3} film, presumably responsible for its lower efficiency as a diffusion barrier. (orig.)

  11. An investigation of thin-film Ni-Fe oxide catalysts for the electrochemical evolution of oxygen.

    Science.gov (United States)

    Louie, Mary W; Bell, Alexis T

    2013-08-21

    A detailed investigation has been carried out of the structure and electrochemical activity of electrodeposited Ni-Fe films for the oxygen evolution reaction (OER) in alkaline electrolytes. Ni-Fe films with a bulk and surface composition of 40% Fe exhibit OER activities that are roughly 2 orders of magnitude higher than that of a freshly deposited Ni film and about 3 orders of magnitude higher than that of an Fe film. The freshly deposited Ni film increases in activity by as much as 20-fold during exposure to the electrolyte (KOH); however, all films containing Fe are stable as deposited. The oxidation of Ni(OH)2 to NiOOH in Ni films occurs at potentials below the onset of the OER. Incorporation of Fe into the film increases the potential at which Ni(OH)2/NiOOH redox occurs and decreases the average oxidation state of Ni in NiOOH. The Tafel slope (40 mV dec(-1)) and reaction order in OH(-) (1) for the mixed Ni-Fe films (containing up to 95% Fe) are the same as those for aged Ni films. In situ Raman spectra acquired in 0.1 M KOH at OER potentials show two bands characteristic of NiOOH. The relative intensities of these bands vary with Fe content, indicating a change in the local environment of Ni-O. Similar changes in the relative intensities of the bands and an increase in OER activity are observed when pure Ni films are aged. These observations suggest that the OER is catalyzed by Ni in Ni-Fe films and that the presence of Fe alters the redox properties of Ni, causing a positive shift in the potential at which Ni(OH)2/NiOOH redox occurs, a decrease in the average oxidation state of the Ni sites, and a concurrent increase in the activity of Ni cations for the OER.

  12. Fast electrochemical deposition of Ni(OH)2 precursor involving water electrolysis for fabrication of NiO thin films

    Science.gov (United States)

    Koyama, Miki; Ichimura, Masaya

    2018-05-01

    Ni(OH)2 precursor films were deposited by galvanostatic electrochemical deposition (ECD), and NiO thin films were fabricated by annealing in air. The effects of the deposition current densities were studied in a range that included current densities high enough to electrolyze water and generate hydrogen bubbles. The films fabricated by ECD involving water electrolysis had higher transparency and smoother surface morphology than those deposited with lower current densities. In addition, the annealed NiO films clearly had preferred (111) orientation when the deposition was accompanied by water electrolysis. p-type conduction was confirmed for the annealed films.

  13. Intrinsic ductility and environmental embrittlement of binary Ni3Al

    International Nuclear Information System (INIS)

    George, E.P.; Liu, C.T.; Pope, D.P.

    1993-01-01

    Polycrystalline, B-free Ni 3 Al (23.4 at.% Al), produced by cold working and recrystallizing a single crystal, exhibits room temperature tensile ductilities of 3-5% in air and 13-16% in oxygen. These ductilities are considerably higher than anything previously reported, and demonstrate that the 'intrinsic' ductility of Ni 3 Al is much higher than previously thought. They also show that the moisture present in ordinary ambient air can severely embrittle Ni 3 Al (ductility decreasing from a high of 16% in oxygen to a low of 3% in air). Fracture is predominantly intergranular in both air and oxygen. This indicates that, while moisture can further embrittle the GBs in Ni 3 Al, they persist as weak links even in the absence of environmental embrittlement. However, they are not 'intrinsically brittle' as once thought, since they can withstand relatively large plastic deformations prior to fracture. Because B essentially eliminates environmental embrittlement in Ni 3 Al - and environmental embrittlement is a major cause of poor ductility in B-free Ni 3 Al - it is concluded that a significant portion of the so-called B effect must be related to suppression of moisture-induced environmental embrittlement. However, since B-doped Ni 3 Al fractures transgranularly, whereas B-free Ni 3 Al fractures predominantly intergranularly, B must have the added effect that it strengthens the GBs. A comparison with the earlier work on Zr-doped Ni 3 Al shows that Zr improves the ductility of Ni 3 Al, both in air and (and even more dramatically) in oxygen. While the exact mechanism of this ductility improvement is not clear at present, Zr appears to have more of an effect on (enhancing) GB strength than on (suppressing) environmental embrittlement

  14. Electronic excitation-induced structural, optical, and magnetic properties of Ni-doped HoFeO{sub 3} thin films

    Energy Technology Data Exchange (ETDEWEB)

    Habib, Zubida [National Institute of Technology, Department of Chemistry, Srinagar (India); National Institute of Technology, Department of Physics, Srinagar (India); Ikram, Mohd; Mir, Sajad A. [National Institute of Technology, Department of Physics, Srinagar (India); Sultan, Khalid [Central University of Kashmir, Department of Physics, Srinagar (India); Abida [Govt Degree College for Women, Department of Physics, Anantnag, Kashmir (India); Majid, Kowsar [National Institute of Technology, Department of Chemistry, Srinagar (India); Asokan, K. [Inter University Accelerator Centre, New Delhi (India)

    2017-06-15

    Present study investigates the electronic excitation-induced modifications in the structural, optical, and magnetic properties of Ni-doped HoFeO{sub 3} thin films grown by pulsed laser deposition on LaAlO{sub 3} substrates. Electronic excitations were induced by 200 MeV Ag{sup 12+} ion beam. These thin films were then characterized using X-ray diffraction (XRD), atomic force microscopy (AFM), UV-Vis spectroscopy, and magnetic measurements. X-ray diffraction analysis confirms that the crystallite growth occurs in the preferred (111) orientation with orthorhombic structure. The XRD results also show that the crystallite size decreases with ion irradiation. AFM results after irradiation show significant changes in the surface roughness and morphology of these films. The optical parameters measured from absorption measurements reveal reduction in the band gap with Ni doping and enhancement of band gap after irradiation. The magnetization vs field measurement at 75 K shows enhancement in saturation magnetization after irradiation for HoFe{sub 1-x}Ni{sub x}O{sub 3} (x = 0.1 and 0.3) films compared to HoFeO{sub 3} film. Present study shows electronic excitation induces significant changes in the physical properties of these films. (orig.)

  15. Cross-sectional characterization of the dewetting of a Au/Ni bilayer film.

    Science.gov (United States)

    Cen, Xi; Thron, Andrew M; Zhang, Xinming; van Benthem, Klaus

    2017-07-01

    The solid state dewetting of Au/Ni bilayer films was investigated by cross-sectional transmission electron microscopy techniques, including energy-dispersive X-ray spectroscopy, electron energy-loss spectroscopy and precession electron diffraction. After annealing under high vacuum conditions the early stage of film agglomeration revealed significant changes in film morphology and chemical distribution. Both Au and Ni showed texturing. Despite the initial deposition sequence of the as-deposited Au/Ni/SiO 2 /Si interface structure, the majority of the metal/SiO 2 interface was Au/SiO 2 after annealing at 675°C for 1h. Void nucleation was predominantly observed at Au/Ni/SiO 2 triple junctions, rather than grain boundary grooving at free surface of the metal film. Detailed cross-sectional characterization reveals that the Au/Ni interface in addition to small amounts of metal alloying strongly affects film break-up and agglomeration kinetics. The formation of Au/SiO 2 interface sections is found to be energetically preferred over Ni/SiO 2 due to compressive stress in the as-deposited Ni layer. Void nucleation is observed at the film/substrate interface, while the formation of voids at Ni/Au phase boundaries inside the metal film is caused by the Kirkendall effect. Copyright © 2016 Elsevier B.V. All rights reserved.

  16. Microstructure and functional properties of the TiNi- and CuAl-based SMA thin films and coats produced by PVD technique

    International Nuclear Information System (INIS)

    Kolomytsev, V.; Musienko, R.; Nevdacha, V.; Panarin, V.; Pasko, A.; Cesari, E.; Segui, C.; Humbeeck, J. van

    2000-01-01

    The TiNi- and CuAl-based shape memory alloy thin films and wear/corrosion resistant surface coats have been produced by the ion-plasma deposition method with an arc dispersion of the cathode/target. This technique was widely used for production of the coats from a sprayed pure metal or a single-phase alloy. We have offered to use this process for dispersion of the heterophase alloys like shape memory alloys. The arguments for choosing of this technique are discussed with respect to creation of the conditions for preservation not only chemical composition, but also phase structure of an alloy in a covering, thus the shape memory/superelastic effects to be kept in a coat. (orig.)

  17. Fabrication and thermal characterization of amorphous and nanocrystalline Al{sub 9}FeNi/Al{sub 3}Ti compound

    Energy Technology Data Exchange (ETDEWEB)

    Tavoosi, Majid, E-mail: ma.tavoosi@gmail.com

    2017-01-15

    In this study, the fabrication and structural characterization of amorphous/nanocrystalline Al{sub 9}FeNi/Al{sub 3}Ti phase has been performed. In this regards, milling and annealing processes were applied on Al{sub 80}Fe{sub 10}Ti{sub 5}Ni{sub 5} (at. %) powder mixture for different periods of time. The prepared samples were characterized using X-ray diffraction (XRD), scanning and transmission electron microscopy (SEM and TEM) and differential scanning calorimetery (DSC). According to the results, supersaturated solid solution, nanocrystalline Al{sub 9}FeNi/Al{sub 3}Ti (with average crystallite size of about 7 nm) and amorphous phases indicated three different microstructures which can be formed in Al{sub 80}Fe{sub 10}Ti{sub 5}Ni{sub 5} system during milling process. The formed supersaturated solid solution and amorphous phases were unstable and transformed to Al{sub 9}FeNi/Al{sub 3}Ti intermetallic compound during annealing process. It is shown that, Al{sub 9}FeNi phase in Al{sub 9}FeNi/Al{sub 3}Ti intermetallic compound can decompose into Al{sub 3}Ni, Al{sub 13}Fe{sub 4} and liquid phases during a reversible peritectic reaction at 809 °C. - Highlights: • We study the effect of milling process on Al{sub 80}Fe{sub 10}Ti{sub 5}Ni{sub 5} alloy. • We study the effect of annealing on Al{sub 80}Fe{sub 10}Ti{sub 5}Ni{sub 5} supersaturated solid solution phase. • We study the effect of annealing on Al{sub 80}Fe{sub 10}Ti{sub 5}Ni{sub 5} amorphous phase. • We study the thermal behaviour of Al{sub 9}FeNi/Al{sub 3}Ti compound.

  18. Photoelectric work function studies of carbonaceous films containing Ni nanocrystals

    International Nuclear Information System (INIS)

    Czerwosz, E.; Dluzewski, P.; Kutner, T.; Stacewicz, T.

    2003-01-01

    In this paper we present the results of photoelectric work function measurements for carbonaceous films containing Ni nanocrystals. The investigated films were obtained by thermal vacuum deposition method. The structure of films was studied by electron diffraction, transmission microscopy and Raman spectroscopy. Film structure depends on Ni contents in the film volume. Work function determined from photoelectric measurements for all investigated films are similar and lie in the range of 2.65-2.93 eV. The decrease of work function value with the cleaning of the film's surface with UV pulsed laser beam was observed

  19. Ultrathin alumina film on Cu 9at%Al(1 1 1)

    Science.gov (United States)

    Napetschnig, E.; Schmid, M.; Varga, P.

    2008-05-01

    We have investigated the structure of the clean and the oxidized (1 1 1) surface of a Cu-Al alloy with 9 at% Al by scanning tunneling microscopy (STM), Auger electron spectroscopy (AES), low energy ion scattering (LEIS) and low energy electron diffraction (LEED). Annealing of the clean crystal at 680 °C leads to segregation of Al to the surface. The Al concentration at the annealed surface is 23 ± 2% and domains with a (√3 × √3)R30° superstructure are visible, as well as small Cu(1 1 1) areas and disordered patches. Oxidation at 680 °C leads to the formation of a well-ordered flat alumina film with two very similar oxide structures. One oxide structure has a nearly commensurate rectangular cell rotated by 30° with respect to a close-packed row of the substrate and grows in three different domains. The second structure has a commensurate cell consisting of four equivalent building blocks and has a rectangular centered symmetry. This structure is rotated by 18° with respect to a close-packed row of the substrate and grows in six different domains. The rectangular building blocks of these two oxide structures have a similar thickness, the same surface termination and the same number and arrangement of the atoms as the oxide film on NiAl(1 1 0) [G. Kresse, M. Schmid, E. Napetschnig, M. Shishkin, L. Köhler, P. Varga, Science 308 (2005) 1448]. In contrast to the oxide on NiAl(1 1 0), alumina on the Cu-Al alloy crystal does not show stress-induced domain boundaries and grows in large defect-free domains. Thus, Pd deposited on this oxide nucleates not only on domain boundaries and steps but also on the unperturbed oxide, forming (1 1 1)-oriented clusters.

  20. Density and atomic volume in liquid Al-Fe and Al-Ni binary alloys

    Energy Technology Data Exchange (ETDEWEB)

    Plevachuk, Yu. [Ivan Franko National Univ., Lviv (Ukraine). Dept. of Metal Physics; Egry, I.; Brillo, J.; Holland-Moritz, D. [Deutsches Zentrum fuer Luft- und Raumfahrt, Koeln (Germany). Inst. fuer Raumsimulation; Kaban, I. [Chemnitz Univ. of Technolgy (Germany). Inst. of Physics

    2007-02-15

    The density of liquid Al-Fe and Al-Ni binary alloys have been determined over a wide temperature range by a noncontact technique combining electromagnetic levitation and optical dilatometry. The temperature and composition dependences of the density are analysed. A negative excess volume correlates with the negative enthalpy of mixing, compound forming ability and chemical short-range ordering in liquid Al-Fe and Al-Ni alloys. (orig.)

  1. Soft magnetic properties of hybrid ferromagnetic films with CoFe, NiFe, and NiFeCuMo layers

    Energy Technology Data Exchange (ETDEWEB)

    Choi, Jong-Gu [Eastern-western Biomedical Engineering, Sangji University, Wonju 220-702 (Korea, Republic of); Hwang, Do-Guwn [Dept. of Oriental Biomedical Engineering, Sangji University, Wonju 220-702 (Korea, Republic of); Rhee, Jang-Roh [Dept. of Physics, Sookmyung Women' s University, Seoul 140-742 (Korea, Republic of); Lee, Sang-Suk, E-mail: sslee@sangji.ac.kr [Dept. of Oriental Biomedical Engineering, Sangji University, Wonju 220-702 (Korea, Republic of)

    2011-09-30

    Two-layered ferromagnetic alloy films (NiFe and CoFe) with intermediate NiFeCuMo soft magnetic layers of different thicknesses were investigated to understand the relationship between coercivity and magnetization process by taking into account the strength of hard-axis saturation field. The thickness dependence of H{sub EC} (easy-axis coercivity), H{sub HS} (hard-axis saturation field), and {chi} (susceptibility) of the NiFeCuMo thin films in glass/Ta(5 nm)/[CoFe or NiFe(5 nm-t/2)]/NiFeCuMo(t = 0, 4, 6, 8, 10 nm)/[CoFe or NiFe(5 nm-t/2)]/Ta(5 nm) films prepared using the ion beam deposition method was determined. The magnetic properties (H{sub EC}, H{sub HS}, and {chi}) of the ferromagnetic CoFe, NiFe three-layers with an intermediate NiFeCuMo super-soft magnetic layer were strongly dependent on the thickness of the NiFeCuMo layer.

  2. Studies on SiC(p) reinforced Al-Al sub 3 Ni eutectic matrix composites

    International Nuclear Information System (INIS)

    Masrom, A.K.; Foo, L.C.; Ismail, A.B.

    1996-01-01

    An investigation on processing of Al-5.69wt% Ni eutectic with SiC particulate composites is reported. The intermetallic composites are prepared by elemental powder metallurgy route and sintered at two different temperatures, i.e., 600 degree C and 620 degree C. Results show that the metal matrix was Al-Al sub 3 Ni eutectic. The phase analysis by XRD identified the presence of Al sub 3 Ni and Al as dominant phases together with silicon and Al sub 4 C sub 3 phase as minor phases. The Al sub 4 C sub 3 and Si phases are formed during sintering due to SiC-Al interface reaction. SEM micrographs also reveal the formation of microvoid surrounding the SiC particle

  3. Influence of Al grain boundaries segregations and La-doping on embrittlement of intermetallic NiAl

    Energy Technology Data Exchange (ETDEWEB)

    Kovalev, Anatoly I., E-mail: a_kovalev@sprg.ru; Wainstein, Dmitry L.; Rashkovskiy, Alexander Yu.

    2015-11-01

    Highlights: • We investigated Al grain boundaries segregations in ordered pure and La-doped NiAl. • Structural segregation of Al decreases critical strain for brittle cracks nucleation. • La alloying sharply improves plasticity of NiAl intermetallic. • Metallicity of interatomic bonds on grain boundaries increases at La alloying. • We have experimentally measured by EELFS that La atoms are located in Al sublattice. - Abstract: The microscopic nature of intergranular fracture of NiAl was experimentally investigated by the set of electron spectroscopy techniques. The paper demonstrates that embrittlement of NiAl intermetallic compound is caused by ordering of atomic structure that leads to formation of structural aluminum segregations at grain boundaries (GB). Such segregations contain high number of brittle covalent interatomic bonds. The alloying by La increases the ductility of material avoiding Al GB enrichment and disordering GB atomic structure. The influence of La alloying on NiAl mechanical properties was investigated. GB chemical composition, atomic and electronic structure transformations after La doping were investigated by AES, XPS and EELFS techniques. To qualify the interatomic bonds metallicity the Fermi level (E{sub F}) position and electrons density (n{sub eff}) in conduction band were determined in both undoped and doped NiAl. Basing on experimental results the physical model of GB brittleness formation was proposed.

  4. Fabrication and magnetization measurement of Ni thin films on silicon substrate by electrodeposition

    Energy Technology Data Exchange (ETDEWEB)

    Tang Yang [Key Laboratory of Excited State Process, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 16 East Nan-Hu Road, Open Economic Zone, Changchun 130033 (China); Graduate School of the Chinese Academy of Sciences (China); Zhao Dongxu [Key Laboratory of Excited State Process, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 16 East Nan-Hu Road, Open Economic Zone, Changchun 130033 (China)], E-mail: dxzhao2000@yahoo.com.cn; Shen Dezhen; Zhang Jiying; Li Binghui; Lu Youming; Fan Xiwu [Key Laboratory of Excited State Process, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 16 East Nan-Hu Road, Open Economic Zone, Changchun 130033 (China)

    2008-02-29

    Ni thin films were electrodeposited on n-Si (100) substrate from the electrolytes containing Ni(CH{sub 3}COO){sub 2} and CH{sub 3}COONH{sub 4} at room temperature. The scanning electron microscope images of the films reveals the uniform distribution of the nickel all over the substrate surface, which illustrates that the fine Ni films on large scales could be obtained through the method of electrodeposition. Vibrating sample magnetometer measurement with the applied field parallel to the surface shows obvious hysteresis loops of the magnetic thin films. The morphology and magnetism of the Ni thin films evolves with the deposition time increasing. The effect of deposition conditions on the properties of the Ni thin films is investigated.

  5. Cross-sectional characterization of the dewetting of a Au/Ni bilayer film

    Energy Technology Data Exchange (ETDEWEB)

    Cen, Xi; Thron, Andrew M.; Zhang, Xinming; Benthem, Klaus van

    2017-07-15

    The solid state dewetting of Au/Ni bilayer films was investigated by cross-sectional transmission electron microscopy techniques, including energy-dispersive X-ray spectroscopy, electron energy-loss spectroscopy and precession electron diffraction. After annealing under high vacuum conditions the early stage of film agglomeration revealed significant changes in film morphology and chemical distribution. Both Au and Ni showed texturing. Despite the initial deposition sequence of the as-deposited Au/Ni/SiO{sub 2}/Si interface structure, the majority of the metal/SiO{sub 2} interface was Au/SiO{sub 2} after annealing at 675 °C for 1 h. Void nucleation was predominantly observed at Au/Ni/SiO{sub 2} triple junctions, rather than grain boundary grooving at free surface of the metal film. Detailed cross-sectional characterization reveals that the Au/Ni interface in addition to small amounts of metal alloying strongly affects film break-up and agglomeration kinetics. The formation of Au/SiO{sub 2} interface sections is found to be energetically preferred over Ni/SiO{sub 2} due to compressive stress in the as-deposited Ni layer. Void nucleation is observed at the film/substrate interface, while the formation of voids at Ni/Au phase boundaries inside the metal film is caused by the Kirkendall effect. - Highlights: • The dewetting of Au/Ni bilayer films was studied by cross-sectional TEM techniques. • The majority of the metal/SiO{sub 2} interface was comprised of Au/SiO{sub 2} after annealing. • Void formation was dominant for hole nucleation at early dewetting stage. • The Kirkendall effect was also observed to cause the formation of voids.

  6. Laboratory Investigations of Ni-Al Coatings Exposed to Conditions Simulating Biomass Firing

    DEFF Research Database (Denmark)

    Wu, Duoli; Okoro, Sunday Chukwudi; Dahl, Kristian Vinter

    2016-01-01

    Fireside corrosion is a key problem when using biomass fuels in power plants. A possible solution is to apply corrosion resistant coatings. The present paper studies the corrosion and interdiffusion behaviour of a Ni-Al diffusion coating on austenitic stainless steel (TP347H). Ni-Al coatings were...... prepared by electrolytic deposition of nickel followed by pack aluminizing performed at 650˚C. A uniform and dense Ni-Al coating with an outer layer of Ni2Al3 and an inner Ni layer was formed. Samples were exposed to 560°C for 168h in an atmosphere simulating biomass combustion. This resulted in localized...... corrosion attack. Interdiffusion was studied by isothermal heat treatment in static air at 650˚C or 700˚C for up to 3000h. The Ni2Al3 gradually transformed into NiAl and Ni3Al during the interdiffusion process. Porosity developed at the interface between the Ni-Al coating and the Ni layer and expanded...

  7. Biocorrosion investigation of two shape memory nickel based alloys: Ni-Mn-Ga and thin film NiTi.

    Science.gov (United States)

    Stepan, L L; Levi, D S; Gans, E; Mohanchandra, K P; Ujihara, M; Carman, G P

    2007-09-01

    Thin film nitinol and single crystal Ni-Mn-Ga represent two new shape memory materials with potential to be used as percutaneously placed implant devices. However, the biocompatibility of these materials has not been adequately assessed. Immersion tests were conducted on both thin film nitinol and single crystal Ni-Mn-Ga in Hank's balanced salt solution at 37 degrees C and pH 7.4. After 12 h, large pits were found on the Ni-Mn-Ga samples while thin film nitinol displayed no signs of corrosion. Further electrochemical tests on thin film nitinol samples revealed breakdown potentials superior to a mechanically polished nitinol disc. These results suggest that passivation or electropolishing of thin film nitinol maybe unnecessary to promote corrosion resistance.

  8. Study of the magnetic anisotropy in Ni/Cu and Ni/glass thin films

    Energy Technology Data Exchange (ETDEWEB)

    Cherif, S.-M. [Laboratoire PMTM, Institut Galilee, Univeriste Paris 13, Villetaneuse, 93340 (France); Layadi, A. [Departement de Physique, Universite Ferhat Abbas, Setif 19000 (Algeria)]. E-mail: a_layadi@yahoo.fr; Ben Youssef, J. [Laboratoire de Magnetisme de Bretagne, U.B.O., Brest 29238 (France); Nacereddine, C. [Departement de Physique, Universite Ferhat Abbas, Setif 19000 (Algeria); Roussigne, Y. [Laboratoire PMTM, Institut Galilee, Univeriste Paris 13, Villetaneuse, 93340 (France)

    2007-01-01

    The magnetic properties of evaporated Ni/Cu and Ni/glass thin films have been investigated by means of the vibrating sample magnetometer (VSM), the Brillouin light scattering (BLS) and magnetic force microscopy (MFM). The Ni thickness, t, ranges from 31 to 165 nm. The second- and fourth-order magnetic anisotropy constants, K {sub 1} and K {sub 2}, have been included; for the Ni/Cu series, K {sub 1} was found to decrease from 1.0x10{sup 6} to 0.18x10{sup 6} erg/cm{sup 3} as t increases from 31 to 165 nm, while K {sub 2} increased from 0.24x10{sup 6} to 0.8x10{sup 6} erg/cm{sup 3}. Over all the thickness range, the magnetization easy axis is in plane. For thinner films, there is a good agreement between anisotropy constant values inferred from VSM and BLS. Stripe domains were observed for t{>=}165 nm in Ni/glass and t{>=}90 nm in Ni/Cu.

  9. Crystalline, Optical and Electrical Properties of NiZnO Thin Films Fabricated by MOCVD

    International Nuclear Information System (INIS)

    Wang Jin; Wang Hui; Zhao Wang; Ma Yan; Li Wan-Cheng; Shi Zhi-Feng; Zhao Long; Zhang Bao-Lin; Dong Xin; Du Guo-Tong; Xia Xiao-Chuan

    2011-01-01

    NiZnO thin films are grown on c-plane sapphire substrates by using a photo-assisted metal organic chemical vapor deposition (MOCVD) system. The effect of the Ni content on the crystalline, optical and electrical properties of the films are researched in detail. The NiZnO films could retain a basic wurtzite structure when the Ni content is less than 0.18. As Ni content increases, crystal quality degradation could be observed in the x-ray diffraction patterns and a clear red shift of the absorption edge can be observed in the transmittance spectrum. Furthermore, the donor defects in the NiZnO film can be compensated for effectively by increasing the Ni content. The change of Ni content has an important effect on the properties of NiZnO films. (condensed matter: electronic structure, electrical, magnetic, and optical properties)

  10. Effect of Ta Additions on the Microstructure, Damping, and Shape Memory Behaviour of Prealloyed Cu-Al-Ni Shape Memory Alloys

    Directory of Open Access Journals (Sweden)

    Safaa N. Saud

    2017-01-01

    Full Text Available The influence of Ta additions on the microstructure and properties of Cu-Al-Ni shape memory alloys was investigated in this paper. The addition of Ta significantly affects the green and porosity densities; the minimum percentage of porosity was observed with the modified prealloyed Cu-Al-Ni-2.0 wt.% Ta. The phase transformation temperatures were shifted towards the highest values after Ta was added. Based on the damping capacity results, the alloy of Cu-Al-Ni-3.0 wt.% Ta has very high internal friction with the maximum equivalent internal friction value twice as high as that of the prealloyed Cu-Al-Ni SMA. Moreover, the prealloyed Cu-Al-Ni SMAs with the addition of 2.0 wt.% Ta exhibited the highest shape recovery ratio in the first cycle (i.e., 100% recovery, and when the number of cycles is increased, this ratio tends to decrease. On the other hand, the modified alloys with 1.0 and 3.0 wt.% Ta implied a linear increment in the shape recovery ratio with increasing number of cycles. Polarization tests in NaCl solution showed that the corrosion resistance of Cu-Al-Ni-Ta SMA improved with escalating Ta concentration as shown by lower corrosion current densities, higher corrosion potential, and formation of stable passive film.

  11. Effect of Ta Additions on the Microstructure, Damping, and Shape Memory Behaviour of Prealloyed Cu-Al-Ni Shape Memory Alloys.

    Science.gov (United States)

    Saud, Safaa N; Hamzah, E; Bakhsheshi-Rad, H R; Abubakar, T

    2017-01-01

    The influence of Ta additions on the microstructure and properties of Cu-Al-Ni shape memory alloys was investigated in this paper. The addition of Ta significantly affects the green and porosity densities; the minimum percentage of porosity was observed with the modified prealloyed Cu-Al-Ni-2.0 wt.% Ta. The phase transformation temperatures were shifted towards the highest values after Ta was added. Based on the damping capacity results, the alloy of Cu-Al-Ni-3.0 wt.% Ta has very high internal friction with the maximum equivalent internal friction value twice as high as that of the prealloyed Cu-Al-Ni SMA. Moreover, the prealloyed Cu-Al-Ni SMAs with the addition of 2.0 wt.% Ta exhibited the highest shape recovery ratio in the first cycle (i.e., 100% recovery), and when the number of cycles is increased, this ratio tends to decrease. On the other hand, the modified alloys with 1.0 and 3.0 wt.% Ta implied a linear increment in the shape recovery ratio with increasing number of cycles. Polarization tests in NaCl solution showed that the corrosion resistance of Cu-Al-Ni-Ta SMA improved with escalating Ta concentration as shown by lower corrosion current densities, higher corrosion potential, and formation of stable passive film.

  12. Aluminum doped nickel oxide thin film with improved electrochromic performance from layered double hydroxides precursor in situ pyrolytic route

    International Nuclear Information System (INIS)

    Shi, Jingjing; Lai, Lincong; Zhang, Ping; Li, Hailong; Qin, Yumei; Gao, Yuanchunxue; Luo, Lei; Lu, Jun

    2016-01-01

    Electrochromic materials with unique performance arouse great interest on account of potential application values in smart window, low-power display, automobile anti-glare rearview mirror, and e-papers. In this paper, high-performing Al-doped NiO porous electrochromic film grown on ITO substrate has been prepared via a layered double hydroxides(LDHs) precursor in situ pyrolytic route. The Al 3+ ions distributed homogenously within the NiO matrix can significantly influence the crystallinity of Ni-Al LDH and NiO:Al 3+ films. The electrochromic performance of the films were evaluated by means of UV–vis absorption spectroscopy, cyclic voltammetry (CV), electrochemical impedance spectroscopy (EIS), and chronoamperometry(CA) measurements. In addition, the ratio of Ni 3+ /Ni 2+ also varies with Al content which can lead to different electrochemical performances. Among the as-prepared films, NiO film prepared from Ni-Al (19:1) LDH show the best electrochromic performance with a high transparency of 96%, large optical modulation range (58.4%), fast switching speed (bleaching/coloration times are 1.8/4.2 s, respectively) and excellent durability (30% decrease after 2000 cycles). The improved performance was owed to the synergy of large NiO film specific surface area and porous morphology, as well as Al doping stifled the formation of Ni 3+ making bleached state more pure. This LDHs precursor pyrolytic method is simple, low-cost and environmental benign and is feasible for the preparation of NiO:Al and other Al-doped oxide thin film. - Graphical abstract: The ratio of Ni 3+ /Ni 2+ varies with Al content which can lead to different electrochemical performances. Among the as-prepared films, NiO film prepared from Ni-Al (19:1) LDH show the best electrochromic performance with a high transparency of 96%, large optical modulation range, fast switching speed and excellent durability. Display Omitted

  13. Novel micro-patterning processes for thin film NiTi vascular devices

    International Nuclear Information System (INIS)

    Chun, Y J; Mohanchandra, K P; Carman, G P; Levi, D S; Fishbein, M C

    2010-01-01

    In order to create microscale features in thin film NiTi for use in vascular endografts, a novel 'lift-off process' was developed for use with deep reactive ion etching. A wet etching approach is compared to two variations of this new 'lift-off' process. The first lift-off process (lift-off I) used Si posts to define the features of NiTi film deposited on the Si substrate. This method produced fractures in the NiTi when the film was released. The lift-off II process used Si islands as substrate for the film while the Si wafer defined the specific geometric features. Lift-off II process allowed for the creation of various shape patterns (i.e., ellipse, diamond, circle, square, etc) in the range of 5–180 µm. The lift-off II process produced smooth and well aligned micro-patterns in thin film NiTi without the undercutting found in wet etching techniques. The micro-patterned thin film NiTi formed from the lift-off II process was used to cover a stent. In vivo tests were performed to evaluate the endothelialization though patterned thin films. Angiography, histopathology and SEM showed patency of the artery and uniformly promoted endothelial layer covering without thrombosis in both a medium and small artery

  14. NiCo2S4 nanosheet-decorated 3D, porous Ni film@Ni wire electrode materials for all solid-state asymmetric supercapacitor applications.

    Science.gov (United States)

    Saravanakumar, Balasubramaniam; Jayaseelan, Santhana Sivabalan; Seo, Min-Kang; Kim, Hak-Yong; Kim, Byoung-Suhk

    2017-12-07

    Wire type supercapacitors with high energy and power densities have generated considerable interest in wearable applications. Herein, we report a novel NiCo 2 S 4 -decorated 3D, porous Ni film@Ni wire electrode for high performance supercapacitor application. In this work, a facile method is introduced to fabricate a 3D, porous Ni film deposited on a Ni wire as a flexible electrode, followed by decoration with NiCo 2 S 4 as an electroactive material. The fabricated NiCo 2 S 4 -decorated 3D, porous Ni film@Ni wire electrode displays a superior performance with an areal and volumetric capacitance of 1.228 F cm -2 and 199.74 F cm -3 , respectively, at a current density of 0.2 mA cm -1 with a maximum volumetric energy and power density (E V : 6.935 mW h cm -3 ; P V : 1.019 W cm -3 ). Finally, the solid state asymmetric wire type supercapacitor is fabricated using the fabricated NiCo 2 S 4 -decorated 3D, porous Ni film@Ni wire as a positive electrode and N-doped reduced graphene oxide (N-rGO) as a negative electrode and this exhibits good areal and volumetric capacitances of C A : 0.12 F cm -2 and C V : 19.57 F cm -2 with a higher rate capability (92%). This asymmetric wire type supercapacitor demonstrates a low leakage current and self-discharge with a maximum volumetric energy (E V : 5.33 mW h cm -3 ) and power (P V : 855.69 mW cm -3 ) density.

  15. Investigation of oxidation resistance of Ni-Ti film used as oxygen diffusion barrier layer

    International Nuclear Information System (INIS)

    Liu, B.T.; Yan, X.B.; Zhang, X.; Zhou, Y.; Guo, Y.N.; Bian, F.; Zhang, X.Y.

    2009-01-01

    Ni-Ti films prepared at 10 W and 70 W by rf magnetron sputtering are investigated as the oxygen diffusion barrier layer, it is found that crystallinity of Ni-Ti film does not greatly depend on the deposition power. X-ray photoelectron spectroscopy indicates that Ni is still in the form of metallic state from the binding energies of both Ni 2p 3/2 and Ni 2p 1/2 spectra for the sample with 10 W prepared Ni-Ti, however, Ni is oxidized for 70 W prepared Ni-Ti film. Moreover, the (La 0.5 Sr 0.5 )CoO 3 /Pb(Zr 0.40 Ti 0.60 )O 3 /(La 0.5 Sr 0.5 )CoO 3 capacitor grown on high power prepared Ni-Ti film is leaky, however, the capacitor on low power prepared Ni-Ti film possesses very promising physical properties (i.e. remnant polarization of ∼27 μC/cm 2 at 5 V and maximum dielectric constant of 940). Leakage current density of the capacitor grown on low power prepared Ni-Ti film is further investigated, it meets ohmic behavior ( 1.0 V).

  16. First-principles calculations for the elastic properties of Ni-base model superalloys: Ni/Ni3Al multilayers

    International Nuclear Information System (INIS)

    Yun-Jiang, Wang; Chong-Yu, Wang

    2009-01-01

    A model system consisting of Ni[001](100)/Ni 3 Al[001](100) multi-layers are studied using the density functional theory in order to explore the elastic properties of single crystal Ni-based superalloys. Simulation results are consistent with the experimental observation that rafted Ni-base superalloys virtually possess a cubic symmetry. The convergence of the elastic properties with respect to the thickness of the multilayers are tested by a series of multilayers from 2γ'+2γ to 10γ'+10γ atomic layers. The elastic properties are found to vary little with the increase of the multilayer's thickness. A Ni/Ni 3 Al multilayer with 10γ'+10γ atomic layers (3.54 nm) can be used to simulate the mechanical properties of Ni-base model superalloys. Our calculated elastic constants, bulk modulus, orientation-dependent shear modulus and Young's modulus, as well as the Zener anisotropy factor are all compatible with the measured results of Ni-base model superalloys R1 and the advanced commercial superalloys TMS-26, CMSX-4 at a low temperature. The mechanical properties as a function of the γ' phase volume fraction are calculated by varying the proportion of the γ and γ' phase in the multilayers. Besides, the mechanical properties of two-phase Ni/Ni 3 Al multilayer can be well predicted by the Voigt–Reuss–Hill rule of mixtures. (classical areas of phenomenology)

  17. Constitutional and thermal point defects in B2 NiAl

    DEFF Research Database (Denmark)

    Korzhavyi, P. A.; Ruban, Andrei; Lozovoi, A. Y.

    2000-01-01

    The formation energies of point defects and the interaction energies of various defect pairs in NiAl are calculated from first principles within an order N, locally self-consistent Green's-function method in conjunction with multipole electrostatic corrections to the atomic sphere approximation...... distance on their sublattice. The dominant thermal defects in Ni-rich and stoichiometric NiAl are calculated to be triple defects. In Al-rich alloys another type of thermal defect dominates, where two Ni vacancies are replaced by one antisite Al atom. As a result, the vacancy concentration decreases...

  18. Microstructure of Reaction Zone Formed During Diffusion Bonding of TiAl with Ni/Al Multilayer

    Science.gov (United States)

    Simões, Sónia; Viana, Filomena; Koçak, Mustafa; Ramos, A. Sofia; Vieira, M. Teresa; Vieira, Manuel F.

    2012-05-01

    In this article, the characterization of the interfacial structure of diffusion bonding a TiAl alloy is presented. The joining surfaces were modified by Ni/Al reactive multilayer deposition as an alternative approach to conventional diffusion bonding. TiAl substrates were coated with alternated Ni and Al nanolayers. The nanolayers were deposited by dc magnetron sputtering with 14 nm of period (bilayer thickness). Joining experiments were performed at 900 °C for 30 and 60 min with a pressure of 5 MPa. Cross sections of the joints were prepared for characterization of their interfaces by scanning electron microscopy (SEM), transmission electron microscopy (TEM), scanning transmission electron microscopy (STEM), high resolution TEM (HRTEM), energy dispersive x-ray spectroscopy (EDS), and electron backscatter diffraction (EBSD). Several intermetallic compounds form at the interface, assuring the bonding of the TiAl. The interface can be divided into three distinct zones: zone 1 exhibits elongated nanograins, very small equiaxed grains are observed in zone 2, while zone 3 has larger equiaxed grains. EBSD analysis reveals that zone 1 corresponds to the intermetallic Al2NiTi and AlNiTi, and zones 2 and 3 to NiAl.

  19. Graphene synthesis from graphite/Ni composite films grown by sputtering

    International Nuclear Information System (INIS)

    Shin, Dong Hee; Yang, Seung Bum; Shin, Dong Yeol; Kim, Chang Oh; Kim, Sung; Choi, Suk Ho; Paek, Sang Hyon

    2012-01-01

    Graphite/Ni composite films have been deposited on SiO 2 /Si (100) wafers by varying their graphite concentration (n G ) and thickness (t) from 2 to 12 wt% and 40 to 400 nm, respectively, in a RF sputtering system, subsequently annealed at 900 .deg. C for 4 min, and then slowly cooled to room temperature to form graphene layers on Ni surfaces. Several structural-analysis techniques reveal the optimum nG (∼8 wt%) and t (∼160 nm) of the composite films for the synthesis of fewest-layer, defect-minimized graphene. At the annealing temperature, carbon atoms diffuse out from the composite film, followed by their precipitation as graphene on the Ni layer as the carbon solubility limit in Ni is reached during the cooling period. Based on this mechanism, the optimum conditions are explained. Our approach provides an advantage in that the number of layers can be simply tuned by varying n G and t of the composite films.

  20. Alloying process of sputter-deposited Ti/Ni multilayer thin films

    International Nuclear Information System (INIS)

    Cho, H.; Kim, H.Y.; Miyazaki, S.

    2006-01-01

    Alloying process of a Ti/Ni multilayer thin film was investigated in detail by differential scanning calorimetry (DSC), X-ray diffractometry (XRD) and transmission electron microscopy (TEM). The Ti/Ni multilayer thin film was prepared by depositing Ti and Ni layers alternately on a SiO 2 /Si substrate. The number of each metal layer was 100, and the total thickness was 3 μm. The alloy composition was determined as Ti-51 at.%Ni by electron probe micro analysis (EPMA). The DSC curve exhibited three exothermic peaks at 621, 680 and 701 K during heating the as-sputtered multilayer thin film. In order to investigate the alloying process, XRD and TEM observation was carried out for the specimens heated up to various temperatures with the heating rate same as the DSC measurement. The XRD profile of the as-sputtered film revealed only diffraction peaks of Ti and Ni. But reaction layers of 3 nm in thickness were observed at the interfaces of Ti and Ni layers in cross-sectional TEM images. The reaction layer was confirmed as an amorphous phase by the nano beam diffraction analysis. The XRD profiles exhibited that the intensity of Ti diffraction peak decreased in the specimen heat-treated above 600 K. The peak from Ni became broad and shifted to lower diffraction angle. The amorphous layer thickened up to 6 nm in the specimen heated up to 640 K. The diffraction peak corresponding to Ti-Ni B2 phase appeared and the peak from Ni disappeared for the specimen heated up to 675 K. The Ti-Ni B2 crystallized from the amorphous reaction layer. After further heating above the third exothermic peak, the intensity of the peak from the Ti-Ni B2 phase increased, the peak from Ti disappeared and the peaks corresponding to Ti 2 Ni appeared. The Ti 2 Ni phase was formed by the reaction of the Ti-Ni B2 and Ti

  1. Electrochemical corrosion behavior of Ni-containing hypoeutectic Al-Si alloy

    Directory of Open Access Journals (Sweden)

    Abul Hossain

    2015-12-01

    Full Text Available Electrochemical corrosion characteristics of the thermally treated 2 wt % Ni-containing Al-6Si-0.5Mg alloy were studied in NaCl solutions. The corrosion behavior of thermally treated (T6 Al-6Si-0.5Mg (-2Ni alloys in 0.1 M NaCl solution was investigated by electrochemical potentiodynamic polarization technique consisting of linear polarization method using the fit of Tafel plot and electrochemical impedance spectroscopy (EIS techniques. Generally, linear polarization experiments revealed a decrease of the corrosion rate at thermal treated Al-6Si-0.5Mg-2Ni alloy. The EIS test results showed that there is no significant change in charge transfer resistance (Rct after addition of Ni to Al-6Si-0.5Mg alloy. The magnitude of the positive shift in the open circuit potential (OCP, corrosion potential (Ecorr and pitting corrosion potential (Epit increased with the addition of Ni to Al-6Si-0.5Mg alloy. The forms of corrosion in the studied Al-6Si-0.5Mg alloy (except Al-6Si-0.5Mg-2Ni alloy are pitting corrosion as obtained from the scanning electron microscopy (SEM study.

  2. Large magnetocaloric effect of GdNiAl2 compound

    International Nuclear Information System (INIS)

    Dembele, S.N.; Ma, Z.; Shang, Y.F.; Fu, H.; Balfour, E.A.; Hadimani, R.L.; Jiles, D.C.; Teng, B.H.; Luo, Y.

    2015-01-01

    This paper presents the structure, magnetic properties, and magnetocaloric effect of the polycrystalline compound GdNiAl 2 . Powder X-ray diffraction (XRD) measurement and Rietveld refinement revealed that GdNiAl 2 alloy is CuMgAl 2 -type phase structure with about 1 wt% GdNi 2 Al 3 secondary phase. Magnetic measurements suggest that the compound is ferromagnetic and undergoes a second-order phase transition near 28 K. The maximum value of magnetic entropy change reaches 16.0 J/kg K for an applied magnetic field change of 0–50 kOe and the relative cooling power was 6.4×10 2 J/kg. It is a promising candidate as a magnetocaloric material working near liquid hydrogen temperature (~20 K) exhibiting large relative cooling power. - Highlights: • Preferred orientation with axis of [010] was found in the GdNiAl 2 compound. • The ΔS Mmax and the RCP are 16.0 J/kg K and 640 J/kg, respectively, for ΔH=50 kOe. • Relative low rare earth content in GdNiAl 2 comparing with other candidates

  3. Effect of Ti seed and spacer layers on structure and magnetic properties of FeNi thin films and FeNi-based multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Svalov, A.V., E-mail: andrey.svalov@ehu.es [Departamento de Electricidad y Electrónica, Universidad del País Vasco (UPV/EHU), 48080 Bilbao (Spain); Department of Magnetism and Magnetic Nanomaterials, Ural Federal University, 620002 Ekaterinburg (Russian Federation); Larrañaga, A. [SGIker, Servicios Generales de Investigación, Universidad del País Vasco (UPV/EHU), 48080 Bilbao (Spain); Kurlyandskaya, G.V. [Departamento de Electricidad y Electrónica, Universidad del País Vasco (UPV/EHU), 48080 Bilbao (Spain); Department of Magnetism and Magnetic Nanomaterials, Ural Federal University, 620002 Ekaterinburg (Russian Federation)

    2014-10-15

    Highlights: • Fe{sub 19}Ni{sub 81} films and FeNi-based multilayers were prepared by magnetron sputtering. • The samples were deposited onto glass substrates at room temperature. • Ti/FeNi films exhibit good (1 1 1) texture and crystallinity. • The thick Cu seed increases the coercive force of the magnetic layer. • The thin Ti spacer restores the magnetic softness of the Cu/Ti/FeNi multilayers. - Abstract: The microstructure and magnetic properties of sputtered permalloy films and FeNi-based multilayers prepared by magnetron sputtering have been studied. X-ray diffraction measurements indicate that Ti/FeNi films exhibit good (1 1 1) texture and crystallinity. Ti/FeNi bilayers with high crystallographic quality have relatively low resistivity. The Ti seed layer does not influence the magnetic properties of FeNi film in Ti/FeNi bilayers, but the thick Cu seed layer leads to an increase of the coercive force of the magnetic layer. For the FeNi films deposited on thick Cu seed layer, the (0 1 0) and (0 0 2) diffraction peaks of hcp nickel were clearly observed. The thin Ti spacer between Cu and FeNi layers prevents the formation of the nickel phase and restores the magnetic softness of the FeNi layer in the Cu/Ti/FeNi sample. Obtained results can be important for the development of multilayer sensitive elements for giant magnetoimpedance or magnetoresistance detectors.

  4. Controlling the alloy composition of PtNi nanocrystals using solid-state dewetting of bilayer films

    Energy Technology Data Exchange (ETDEWEB)

    Seo, Okkyun; Oh, Se An; Lee, Ji Yeon; Ha, Sung Soo; Kim, Jae Myung; Choi, Jung Won; Kim, Jin-Woo [Department of Physics and Photon Science & School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 61005 (Korea, Republic of); Kang, Hyon Chol [Department of Materials and Science Engineering, Chosun University, Gwangju 61542 (Korea, Republic of); Noh, Do Young, E-mail: dynoh@gist.ac.kr [Department of Physics and Photon Science & School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 61005 (Korea, Republic of)

    2016-05-15

    We demonstrate that solid-state dewetting of bilayer films is an effective way for obtaining bimetallic alloy nanocrystals of controlled composition. When a Pt–Ni bilayer film were annealed near 700 °C, Pt and Ni atoms inter-diffused to form a PtNi bimetallic alloy film. Upon annealing at higher temperatures, the bilayer films transformed into <111> oriented PtNi alloy nanocrystals in small-rhombicuboctahedron shape through solid-state dewetting process. The Pt content of the nanocrystals and the alloy films, estimated by applying the Vegard's law to the relaxed lattice constant, was closely related to the thickness of each layer in the as-grown bilayer films which can be readily controlled during bilayer deposition. - Highlights: • Composition control of PtNi nanoparticles using solid state dewetting is proposed. • PtNi alloy composition was controlled by thickness ratio of Pt–Ni bilayer films. • PtNi alloy nanocrystals were obtained in small-rhombicuboctahedron shape.

  5. Geometric structures of thin film: Pt on Pd(110) and NiO on Ni(100)

    Energy Technology Data Exchange (ETDEWEB)

    Warren, Oden L. [Iowa State Univ., Ames, IA (United States)

    1993-07-01

    This thesis is divided into 3 papers: dynamical low-energy electron- diffraction investigation of lateral displacements in topmost layer of Pd(110); determination of (1x1) and (1x2) structures of Pt thin films on Pd(110) by dynamical low-energy electron-diffraction analysis; and structural determination of a NiO(111) film on Ni(100) by dynamical low-energy electron-diffraction analysis.

  6. NiCo2O4 nanosheets in-situ grown on three dimensional porous Ni film current collectors as integrated electrodes for high-performance supercapacitors

    Science.gov (United States)

    Wang, Tao; Guo, Ying; Zhao, Bo; Yu, Shuhui; Yang, Hai-Peng; Lu, Daniel; Fu, Xian-Zhu; Sun, Rong; Wong, Ching-Ping

    2015-07-01

    Three dimensional interconnected hierarchical porous Ni films are easily fabricated as effective current collectors through hydrogen bubble template electrochemical deposition. The binder-free integrated electrodes of spinel NiCo2O4 nanosheets directly coated the three dimensional porous Ni films are facilely obtained through successively electrochemical co-deposition of Ni/Co alloy layer then followed by subsequent annealing at 350 °C in air. Compared with NiCo2O4 nanosheets on smooth Ni foil or porous NiO/Ni film electrodes, the porous NiCo2O4/Ni integrated film electrodes for supercapacitors demonstrate remarkably higher area specific capacitance. The porous NiCo2O4/Ni film electrodes also exhibit excellent rate capability and cycling stability. The super electrochemical capacitive performances are attributed to the unique integrated architecture of NiCo2O4 nanosheets in-situ grown on three dimensional continuous hierarchical porous Ni collector collectors, which could provide large electrode-electrolyte interface area, high active sites, low contact resistance between current collector and active materials, fast electron conduction and ion/electrolyte diffusion.

  7. Modulation of magnetic coercivity in Ni thin films by reversible control of strain

    Energy Technology Data Exchange (ETDEWEB)

    Lin, Wen-Chin, E-mail: wclin@ntnu.edu.tw [Department of Physics, National Taiwan Normal University, Taipei 116, Taiwan (China); Huang, Chia-Wei; Ting, Yi-Chieh; Lo, Fang-Yuh [Department of Physics, National Taiwan Normal University, Taipei 116, Taiwan (China); Chern, Ming-Yau [Department of Physics, National Taiwan University, Taipei 106, Taiwan (China)

    2015-05-01

    In this study, we demonstrated the magnetoelectric control of magnetic thin films. (111)-textured Pd/Ni/Pd thin films were prepared on mica/lead zirconium titanate (PZT) substrates for the investigation. The reversible modulation of magnetic coercivity in Ni films was observed through the electric-voltage-controlled strain variation from the PZT substrate. For 14 nm Ni film, the applied electric field of ±350 V/m led to ±0.5% strain variation of PZT, which was transferred to ±0.4% strain variation of Pd/Ni/Pd thin films on mica, and resulted in ∓17 Oe (∓5% of the preliminary magnetic coercivity). The reversible modulation of magnetic coercivity is supposed to be caused by the voltage-controlled strain through the magneto-elastic effect. - Highlights: • The magnetoelectric control of the magnetic coercivity of Pd/Ni/Pd thin films was demonstrated. • The ±0.4% strain variation of 14 nm Ni thin films resulted in ±17 Oe change of H{sub c}. • The reversible modulation of H{sub c} is supposed to be caused by the magneto-elastic effect.

  8. Magnetic and optical properties of MgAl2O4-(Ni0.5Zn0.5Fe2O4 thin films prepared by pulsed laser deposition

    Directory of Open Access Journals (Sweden)

    Takeshi Misu, Naonori Sakamoto, Kazuo Shinozaki, Nobuyasu Adachi, Hisao Suzuki and Naoki Wakiya

    2011-01-01

    Full Text Available Thin films composed of MgAl2O4 and (Ni0.5Zn0.5Fe2O4 ([MA(100-x-NZFx] films were grown on fused SiO2 substrates by pulsed laser deposition. X-ray diffraction measurements revealed that the films were polycrystalline, and that their lattice constant varied linearly with composition, indicating the formation of a solid solution. The film with x=60 was paramagnetic and those with x ≥ 70 were ferromagnetic. The films had a transparency above 75% in the visible range, but the transparency decreased with the x value. The optical band gaps were 2.95, 2.55, 2.30 and 1.89 eV for x=20, 40, 60, 80 and 100, respectively. The Faraday rotation angle increased with x in the visible range, and the film with x=70 exhibited a value of 2000 degrees cm-1 at 570 nm, which is comparable to the rotation angle of Y3Fe5O12. Owing to their high transparency, which extends into the visible range, the [MA(100-x-NZFx] films can be used in novel magneto-optical devices.

  9. The Ni3Al and NiAl alloys: a class of intermetallics which can replace the Ni-base superalloys for the aerospace high temperature structural applications

    International Nuclear Information System (INIS)

    Lucaci, M.; Vidu, C.D.; Vasile, E.

    2001-01-01

    The paper presents the results obtained in synthesizing Ni-base refractory intermetallics from elemental powder mixes. In view of this, four mixes were made for the Ni 3 Al intermetallics and five mixes for the NiAl ones. The compound synthesis was made at T = 660 o C under vacuum by the SHS method, in the thermo-explosion mode. The variable parameters were the compacting pressure and the aluminum amount in the mixes. The obtained materials were then characterized by the microstructure and by the physical properties. The product synthesis degree was followed as well as their influence on the types of microstructures obtained. The reaction products were evidenced by x-ray diffraction and by quantitative chemical microanalysis. The obtained results revealed the formation of the Ni 3 Al compound having a primitive cubic crystal lattice with a 0 = 3,564 Aa and the formation of the NiAl compound, of a bcc lattice having a 0 = 2,86 Aa. Those obtained prove the ample influences of the powder homogeneity degree and of the powder purity on the possibility to produce an adequate synthesis, as well as the influence of the amount liquid appeared in the system on the synthesis degree, on the reaction rate and on the porosity of materials obtained. (author)

  10. Aluminum doped nickel oxide thin film with improved electrochromic performance from layered double hydroxides precursor in situ pyrolytic route

    Energy Technology Data Exchange (ETDEWEB)

    Shi, Jingjing; Lai, Lincong; Zhang, Ping; Li, Hailong; Qin, Yumei; Gao, Yuanchunxue; Luo, Lei; Lu, Jun, E-mail: lujun@mail.buct.edu.cn

    2016-09-15

    Electrochromic materials with unique performance arouse great interest on account of potential application values in smart window, low-power display, automobile anti-glare rearview mirror, and e-papers. In this paper, high-performing Al-doped NiO porous electrochromic film grown on ITO substrate has been prepared via a layered double hydroxides(LDHs) precursor in situ pyrolytic route. The Al{sup 3+} ions distributed homogenously within the NiO matrix can significantly influence the crystallinity of Ni-Al LDH and NiO:Al{sup 3+} films. The electrochromic performance of the films were evaluated by means of UV–vis absorption spectroscopy, cyclic voltammetry (CV), electrochemical impedance spectroscopy (EIS), and chronoamperometry(CA) measurements. In addition, the ratio of Ni{sup 3+}/Ni{sup 2+} also varies with Al content which can lead to different electrochemical performances. Among the as-prepared films, NiO film prepared from Ni-Al (19:1) LDH show the best electrochromic performance with a high transparency of 96%, large optical modulation range (58.4%), fast switching speed (bleaching/coloration times are 1.8/4.2 s, respectively) and excellent durability (30% decrease after 2000 cycles). The improved performance was owed to the synergy of large NiO film specific surface area and porous morphology, as well as Al doping stifled the formation of Ni{sup 3+} making bleached state more pure. This LDHs precursor pyrolytic method is simple, low-cost and environmental benign and is feasible for the preparation of NiO:Al and other Al-doped oxide thin film. - Graphical abstract: The ratio of Ni{sup 3+}/Ni{sup 2+} varies with Al content which can lead to different electrochemical performances. Among the as-prepared films, NiO film prepared from Ni-Al (19:1) LDH show the best electrochromic performance with a high transparency of 96%, large optical modulation range, fast switching speed and excellent durability. Display Omitted.

  11. Developing high-transmittance heterojunction diodes based on NiO/TZO bilayer thin films

    Science.gov (United States)

    2013-01-01

    In this study, radio frequency magnetron sputtering was used to deposit nickel oxide thin films (NiO, deposition power of 100 W) and titanium-doped zinc oxide thin films (TZO, varying deposition powers) on glass substrates to form p(NiO)-n(TZO) heterojunction diodes with high transmittance. The structural, optical, and electrical properties of the TZO and NiO thin films and NiO/TZO heterojunction devices were investigated with scanning electron microscopy, X-ray diffraction (XRD) patterns, UV-visible spectroscopy, Hall effect analysis, and current-voltage (I-V) analysis. XRD analysis showed that only the (111) diffraction peak of NiO and the (002) and (004) diffraction peaks of TZO were observable in the NiO/TZO heterojunction devices, indicating that the TZO thin films showed a good c-axis orientation perpendicular to the glass substrates. When the sputtering deposition power for the TZO thin films was 100, 125, and 150 W, the I-V characteristics confirmed that a p-n junction characteristic was successfully formed in the NiO/TZO heterojunction devices. We show that the NiO/TZO heterojunction diode was dominated by the space-charge limited current theory. PMID:23634999

  12. High-temperature deformation of B2 NiAl-base alloys

    International Nuclear Information System (INIS)

    Lee, I.G.; Ghosh, A.K.

    1994-01-01

    The high-temperature deformation behavior of three rapidly solidified and processed NiAl-base alloys--NiAl, NiAl containing 2 pct TiB 2 , and NiAl containing 4 pct HfC--have been studied and their microstructural and textural changes during deformation characterized. Compressions tests were conducted at 1,300 and 1,447 K at strain rates ranging from 10 -6 to 10 -2 s -1 . HfC-containing material showed dispersion strengthening as well as some degree of grain refinement over NiAl, while TiB 2 dispersoid-containing material showed grain refinement as well as secondary recrystallization and did not improve high-temperature strength. Hot-pack rolling was also performed to develop thin sheet materials (1.27-mm thick) and from these alloys. Without dispersoids, NiAl rolled easily at 1,223 K and showed low flow stress and good ductility during the hot-rolling operation. Rolling of dispersoid-containing alloys was difficult due to strain localization and edge-cracking effects, resulting partly from the high flow stress at the higher strain rate during the rolling operation. Sheet rolling initially produced a {111} texture, which eventually broke into multiple-texture components with severe deformation

  13. Magnetotransport effects of ultrathin Ni80Fe20 films probed in situ

    International Nuclear Information System (INIS)

    Krzyk, S; Schmidsfeld, A; Klaeui, M; Ruediger, U

    2010-01-01

    We investigated the magnetoresistance of Permalloy (Ni 80 Fe 20 ) films with thicknesses ranging from a single monolayer to 12 nm, grown on Al 2 O 3 , MgO and SiO 2 substrates. Growth and transport measurements were carried out at 80 K in UHV. Applying in-plane magnetic vector fields up to 100 mT, the magnetotransport properties were ascertained during growth. With increasing thickness the films exhibited a gradual transition from tunnelling magnetoresistance to anisotropic magnetoresistance. This corresponds to the evolution of the film structure from separated small islands to a network of interconnected grains, as well as the film's transition from superparamagnetic to ferromagnetic behaviour. Using an analysis based on a theoretical model of island growth, we found that the observed evolution of the magnetoresistance in the tunnelling regime originated from changes in the island size distribution during growth. Depending on the substrate material, significant differences in the magnetoresistance response in the transition regime between tunnelling magnetoresistance and anisotropic magnetoresistance were found. We attributed this to an increasingly pronounced island growth, and to a slower percolation process of Permalloy when comparing growth on SiO 2 , MgO and Al 2 O 3 substrates. The different growth characteristics resulted in a markedly earlier onset of both tunnelling magnetoresistance and anisotropic magnetoresistance for SiO 2 . For Al 2 O 3 in particular the growth mode results in a structure of the film containing two different contributions to ferromagnetism, which lead to two distinct coercive fields in the high thickness regime.

  14. Cell adhesion on NiTi thin film sputter-deposited meshes

    Energy Technology Data Exchange (ETDEWEB)

    Loger, K. [Inorganic Functional Materials, Institute for Materials Science, Faculty of Engineering, University of Kiel (Germany); Engel, A.; Haupt, J. [Department of Cardiovascular Surgery, University Hospital of Schleswig-Holstein, Kiel (Germany); Li, Q. [Biocompatible Nanomaterials, Institute for Materials Science, Faculty of Engineering, University of Kiel (Germany); Lima de Miranda, R. [Inorganic Functional Materials, Institute for Materials Science, Faculty of Engineering, University of Kiel (Germany); ACQUANDAS GmbH, Kiel (Germany); Quandt, E. [Inorganic Functional Materials, Institute for Materials Science, Faculty of Engineering, University of Kiel (Germany); Lutter, G. [Department of Cardiovascular Surgery, University Hospital of Schleswig-Holstein, Kiel (Germany); Selhuber-Unkel, C. [Biocompatible Nanomaterials, Institute for Materials Science, Faculty of Engineering, University of Kiel (Germany)

    2016-02-01

    Scaffolds for tissue engineering enable the possibility to fabricate and form biomedical implants in vitro, which fulfill special functionality in vivo. In this study, free-standing Nickel–Titanium (NiTi) thin film meshes were produced by means of magnetron sputter deposition. Meshes contained precisely defined rhombic holes in the size of 440 to 1309 μm{sup 2} and a strut width ranging from 5.3 to 9.2 μm. The effective mechanical properties of the microstructured superelastic NiTi thin film were examined by tensile testing. These results will be adapted for the design of the holes in the film. The influence of hole and strut dimensions on the adhesion of sheep autologous cells (CD133 +) was studied after 24 h and after seven days of incubation. Optical analysis using fluorescence microscopy and scanning electron microscopy showed that cell adhesion depends on the structural parameters of the mesh. After 7 days in cell culture a large part of the mesh was covered with aligned fibrous material. Cell adhesion is particularly facilitated on meshes with small rhombic holes of 440 μm{sup 2} and a strut width of 5.3 μm. Our results demonstrate that free-standing NiTi thin film meshes have a promising potential for applications in cardiovascular tissue engineering, particularly for the fabrication of heart valves. - Highlights: • Freestanding NiTi thin film scaffolds were fabricated with magnetron sputtering process. • Effective mechanical properties of NiTi scaffolds can be adapted by the mesh structure parameters. • Cell adhesion on the NiTi thin film scaffold is controlled by the structure parameters of the mesh. • Cells strongly adhere after seven days and form a confluent layer on the mesh.

  15. Cell adhesion on NiTi thin film sputter-deposited meshes

    International Nuclear Information System (INIS)

    Loger, K.; Engel, A.; Haupt, J.; Li, Q.; Lima de Miranda, R.; Quandt, E.; Lutter, G.; Selhuber-Unkel, C.

    2016-01-01

    Scaffolds for tissue engineering enable the possibility to fabricate and form biomedical implants in vitro, which fulfill special functionality in vivo. In this study, free-standing Nickel–Titanium (NiTi) thin film meshes were produced by means of magnetron sputter deposition. Meshes contained precisely defined rhombic holes in the size of 440 to 1309 μm 2 and a strut width ranging from 5.3 to 9.2 μm. The effective mechanical properties of the microstructured superelastic NiTi thin film were examined by tensile testing. These results will be adapted for the design of the holes in the film. The influence of hole and strut dimensions on the adhesion of sheep autologous cells (CD133 +) was studied after 24 h and after seven days of incubation. Optical analysis using fluorescence microscopy and scanning electron microscopy showed that cell adhesion depends on the structural parameters of the mesh. After 7 days in cell culture a large part of the mesh was covered with aligned fibrous material. Cell adhesion is particularly facilitated on meshes with small rhombic holes of 440 μm 2 and a strut width of 5.3 μm. Our results demonstrate that free-standing NiTi thin film meshes have a promising potential for applications in cardiovascular tissue engineering, particularly for the fabrication of heart valves. - Highlights: • Freestanding NiTi thin film scaffolds were fabricated with magnetron sputtering process. • Effective mechanical properties of NiTi scaffolds can be adapted by the mesh structure parameters. • Cell adhesion on the NiTi thin film scaffold is controlled by the structure parameters of the mesh. • Cells strongly adhere after seven days and form a confluent layer on the mesh.

  16. Moessbauer effect measurements on the intermetallic compounds Ni3Al and Ni3Ge

    International Nuclear Information System (INIS)

    Drijver, J.W.; Woude, F. van der

    1975-01-01

    Moessbauer parameters obtained from room temperature emission and absorption spectra of Ni 3 Al and Ni 3 Ga processed by a computer assuming a singlet and a doublet are given. The doublet is due to iron or cobalt atoms at the nickel site. Quadrupole splitting at 57 Fe nuclei in Ni 3 Ga is larger than in Ni 3 Al, viz. 0.52 and 0.37 mm/sec, respectively. Isomer shift at the Al/Ga position is very close to -0.02 mm/sec found in metallic nickel. Also given are the hyperfine magnetic fields at 4.2 K. Considering the preference of 57 Co and 57 Fe atoms in the lattice, the field intensities at the nickel and aluminium sites are found to be 227 +- 1 and 238 +- 1 kOe, respectively. (Z.S.)

  17. Hot corrosion of Co-Cr, Co-Cr-Al, and Ni-Cr alloys in the temperature range of 700-750 deg C

    Science.gov (United States)

    Chiang, K. T.; Meier, G. H.

    1980-01-01

    The effect of SO3 pressure in the gas phase on the Na2SO4 induced hot corrosion of Co-Cr, Ni-Cr, and Co-Cr-Al alloys was studied in the temperature range 700 to 750 C. The degradation of the Co-Cr and Ni-Cr alloys was found to be associated with the formation of liquid mixed sulfates (CoSO4-Na2SO4 or NiSO4-Na2SO4) which provided a selective dissolution of the Co or Ni and a subsequent sulfidation oxidation mode of attack which prevented the maintenance of a protective Cr2O3 film. A clear mechanism was not developed for the degradation of Co-Cr-Al alloys. A pitting corrosion morphology was induced by a number of different mechanisms.

  18. Properties of NiO thin films deposited by chemical spray pyrolysis using different precursor solutions

    Energy Technology Data Exchange (ETDEWEB)

    Cattin, L. [Universite de Nantes, Nantes Atlantique Universites, LAMP, EA 3825, Faculte des Sciences et des Techniques, 2 rue de la Houssiniere, BP 92208, Nantes F-44000 (France); Reguig, B.A.; Khelil, A. [Universite d' Oran Es-Senia, LPCM2E (Algeria); Morsli, M. [Universite de Nantes, Nantes Atlantique Universites, LAMP, EA 3825, Faculte des Sciences et des Techniques, 2 rue de la Houssiniere, BP 92208, Nantes F-44000 (France); Benchouk, K. [Universite d' Oran Es-Senia, LPCM2E (Algeria); Bernede, J.C. [Universite de Nantes, Nantes Atlantique Universites, LAMP, EA 3825, Faculte des Sciences et des Techniques, 2 rue de la Houssiniere, BP 92208, Nantes F-44000 (France)], E-mail: Jean-Christian.Bernede@univ-nantes.fr

    2008-07-15

    NiO thin films have been deposited by chemical spray pyrolysis using a perfume atomizer to grow the aerosol. The influence of the precursor, nickel chloride hexahydrate (NiCl{sub 2}.6H{sub 2}O), nickel nitrate hexahydrate (Ni(NO{sub 3}){sub 2}.6H{sub 2}O), nickel hydroxide hexahydrate (Ni(OH){sub 2}.6H{sub 2}O), nickel sulfate tetrahydrate (NiSO{sub 4}.4H{sub 2}O), on the thin films properties has been studied. In the experimental conditions used (substrate temperature 350 deg. C, precursor concentration 0.2-0.3 M, etc.), pure NiO thin films crystallized in the cubic phase can be achieved only with NiCl{sub 2} and Ni(NO{sub 3}){sub 2} precursors. These films have been post-annealed at 425 deg. C for 3 h either in room atmosphere or under vacuum. If all the films are p-type, it is shown that the NiO films conductivity and optical transmittance depend on annealing process. The properties of the NiO thin films annealed under room atmosphere are not significantly modified, which is attributed to the fact that the temperature and the environment of this annealing is not very different from the experimental conditions during spray deposition. The annealing under vacuum is more efficient. This annealing being proceeded in a vacuum no better than 10{sup -2} Pa, it is supposed that the modifications of the NiO thin film properties, mainly the conductivity and optical transmission, are related to some interaction between residual oxygen and the films.

  19. Deuterium absorption in Mg70Al30 thin films with bilayer catalysts: A comparative neutron reflectometry study

    International Nuclear Information System (INIS)

    Poirier, Eric; Harrower, Chris T.; Kalisvaart, Peter; Bird, Adam; Teichert, Anke; Wallacher, Dirk; Grimm, Nico; Steitz, Roland; Mitlin, David; Fritzsche, Helmut

    2011-01-01

    Highlights: → Mg 70 Al 30 thin films studied for hydrogen absorption using in situ neutron reflectometry. → Films with Ta/Pd, Ti/Pd and Ni/Pd bilayer catalysts systematically compared. → Measurements reveals deuterium spillover from the catalysts to the MgAl phase. → The use of Ti-Pd bilayer offers best results in terms of amount absorbed and kinetics. → Key results cross-checked with X-ray reflectometry. - Abstract: We present a neutron reflectometry study of deuterium absorption in thin films of Al-containing Mg alloys capped with a Ta/Pd, Ni/Pd and Ti/Pd-catalyst bilayer. The measurements were performed at room temperature over the 0-1 bar pressure range under quasi-equilibrium conditions. The modeling of the measurements provided a nanoscale representation of the deuterium profile in the layers at different stages of the absorption process. The absorption mechanism observed was found to involve spillover of atomic deuterium from the catalyst layer to the Mg alloy phase, followed by the deuteration of the Mg alloy. Complete deuteration of the Mg alloy occurs in a pressure range between 100 and 500 mbar, dependent on the type of bilayer catalyst. The use of a Ti/Pd bilayer catalyst yielded the best results in terms of both storage density and kinetic properties.

  20. Effect of substrate temperature and oxygen partial pressure on RF sputtered NiO thin films

    Science.gov (United States)

    Cheemadan, Saheer; Santhosh Kumar, M. C.

    2018-04-01

    Nickel oxide (NiO) thin films were deposited by RF sputtering process and the physical properties were investigated for varying substrate temperatures and oxygen partial pressure. The variation of the crystallographic orientation and microstructure of the NiO thin films with an increase in substrate temperature were studied. It was observed that NiO thin films deposited at 350 °C shows relatively good crystalline characteristics with a preferential orientation along (111) plane. With the optimum substrate temperature of 350 °C, the NiO thin films were deposited under various oxygen partial pressures at the same experimental conditions. The structural, optical and electrical properties of NiO thin films under varying oxygen partial pressure of 10%–50% were investigated. From XRD it is clear that the films prepared in the pure argon atmosphere were amorphous while the films in oxygen partial pressure exhibited polycrystalline NiO phase. SEM and AFM investigations unveil that the higher substrate temperature improves the microstructure of the thin films. It is revealed that the NiO thin films deposited at oxygen partial pressure of 40% and a substrate temperature of 350 °C, showed higher electrical conductivity with p-type characteristics.

  1. Stability of the composites: NiAl - cellular high-melting point metal

    International Nuclear Information System (INIS)

    Belomyttsev, M.Yu.; Kozlov, D.A.

    2006-01-01

    For sintered composite materials (CM) NiAl-W and NiAl-W-Mo the structure and mechanical properties are studied. A comparative analysis of the effect of hot deformation by compression at 1000-1300 Deg C on the integrity of microsamples themselves and tungsten shells of NiAl granules in CM with a cellular structure is accomplished. Local chemical composition of a NiAl/refractory metal interface in CM with cellular structure and free of it is determined. A CM structural state effect on compression yield strength at 1000 Deg C is estimated. The treatment is proposed which permits approaching cellular structured CM oxidation resistance at 1000-1100 Deg C to the level of heat stability of unalloyed NiAl or its alloy with Hf [ru

  2. Structure, surface morphology and electrical properties of evaporated Ni thin films: Effect of substrates, thickness and Cu underlayer

    International Nuclear Information System (INIS)

    Hemmous, M.; Layadi, A.; Guittoum, A.; Souami, N.; Mebarki, M.; Menni, N.

    2014-01-01

    Series of Ni thin films have been deposited by thermal evaporation onto glass, Si(111), Cu, mica and Al 2 O 3 substrates with and without a Cu underlayer. The Ni thicknesses, t, are in the 4 to 163 nm range. The Cu underlayer has also been evaporated with a Cu thickness equal to 27, 52 and 90 nm. The effects of substrate, the Ni thickness and the Cu underlayer on the structural and electrical properties of Ni are investigated. Rutherford Backscattering Spectroscopy was used to probe the Ni/Substrate and Ni–Cu underlayer interfaces and to measure both Ni and Cu thicknesses. The texture, the strain and the grain size values were derived from X-ray diffraction experiments. The surface morphology is studied by means of a Scanning Electron Microscope. The electrical resistivity is measured by the four point probe. The Ni films grow with the <111> texture on all substrates. The Ni grain sizes D increase with increasing thickness for the glass, Si and mica substrates and decrease for the Cu one. The strain ε is positive for low thickness, decreases in magnitude and becomes negative as t increases. With the Cu underlayer, the growth mode goes through two phases: first, the stress (grain size) increases (decreases) up to a critical thickness t Cr , then stress is relieved and grain size increases. All these results will be discussed and correlated. - Highlights: • The structural and electrical properties of evaporated Ni thin films are studied. • The effect of thickness, substrates and Cu underlayer is investigated. • Texture, grain size, strain and surface morphology are discussed. • Growth modes are described as a function of Ni thickness

  3. High-temperature resistant MeCrAlY+Al coatings obtained by ARC-PVD method on Ni Base superalloys

    International Nuclear Information System (INIS)

    Swadzba, L.; Maciejny, A.; Mendala, B.; Supernak, W.

    1999-01-01

    Investigations of obtaining high temperature coatings on the Ni base superalloys by the ARC-PVD method, using exothermic reaction processes between Ni and Al with NiAl intermetallic formation are presented in the article. By the diffusion heating at 1050 o C NiAl high temperature diffusion coating containing 21% at. Al and 50 μm thick was obtained. In the next stage coatings with more complex chemical composition NiCoCrAlY were formed. The two targets were applied for formation of complex NiCoCrAlY coatings. The good consistence between the chemical composition of the targets and the coatings and an uniform distribution of elements in the coatings were shown. Then the surface was covered with aluminium also by the ARC-PVD method. In the vacuum chamber of the equipment a synthesis reaction between NiCoCrAlY and Al with the formation NiAl intermetallics of high Co, Cr, Y content was initiated by the changes in process parameters. The final heat treatment of coatings was conducted in the air and vacuum at 1050 o C. The strong segregation of yttrium in to the oxide scale in the specimens heated in the air was shown. It was possible to obtain NiAl intermetallic phase coatings modified by Co, Cr and Y by the ARC-PVD method. An example of the application of this method for the aircraft engine turbine blades was presented. Method of ARC-PVD gives the possibility chemical composition and high resistance to oxidizing and hot corrosion. (author)

  4. Enhancement of room temperature ferromagnetic behavior of rf sputtered Ni-CeO_2 thin films

    International Nuclear Information System (INIS)

    Murugan, R.; Vijayaprasath, G.; Mahalingam, T.; Ravi, G.

    2016-01-01

    Highlights: • Ni-CeO_2 thin films deposited by using rf Magnetron sputtering with different concentrations of Ni. • Deposited thin films have single crystalline and uniform surface morphology. • Photoluminescence and micro-Raman spectra were interpreted for Ni-CeO_2 thin films. • XPS spectra confirmed Ni ions were present in the doped CeO_2 thin films. • Ni ions induced ferromagnetic behavior of Ni-CeO_2 films were confirmed through VSM. - Abstract: Ni-doped CeO_2 thin films were prepared under Ar"+ atmosphere on glass substrates using rf magnetron sputtering. To assess the properties of the prepared thin films, the influence of various amounts of Ni dopant on structural, morphological, optical, vibrational, compositional and magnetic properties of the CeO_2 films were studied by using X-Ray diffraction (XRD), atomic force microscope (AFM), photoluminescence (PL), micro-Raman, X-ray photoelectron spectroscopy (XPS) and vibrating sample magnetometer (VSM). XRD patterns for all the samples revealed the expected CeO_2 cubic fluorite-type structure and Ni ions were uniformly distributed in the samples. AFM images of the prepared samples indicate high dense, columnar structure with uniform distribution of CeO_2. Room-temperature photoluminescence (PL) and micro-Raman spectroscopic studies revealed an increase of oxygen vacancies with higher concentration of Ni in CeO_2. XPS results confirm the presence of Ni_2_p, O_1_s and Ce and depict that cerium is present as both Ce"4"+ and Ce"3"+ oxidation states in Ce_1_−_xNi_xO_2 (x = 15%) thin film. Field dependent magnetization measurements revealed a paramagnetic behavior for pure CeO_2, while a ferromagnetic behavior appeared when Ni is doped in CeO_2 films. Doping dependent magnetization measurements suggest that the observed ferromagnetism is due to the presence of metallic Ni clusters with nanometric size and broad size distribution.

  5. Influence of Al grain boundaries segregations and La-doping on embrittlement of intermetallic NiAl

    Science.gov (United States)

    Kovalev, Anatoly I.; Wainstein, Dmitry L.; Rashkovskiy, Alexander Yu.

    2015-11-01

    The microscopic nature of intergranular fracture of NiAl was experimentally investigated by the set of electron spectroscopy techniques. The paper demonstrates that embrittlement of NiAl intermetallic compound is caused by ordering of atomic structure that leads to formation of structural aluminum segregations at grain boundaries (GB). Such segregations contain high number of brittle covalent interatomic bonds. The alloying by La increases the ductility of material avoiding Al GB enrichment and disordering GB atomic structure. The influence of La alloying on NiAl mechanical properties was investigated. GB chemical composition, atomic and electronic structure transformations after La doping were investigated by AES, XPS and EELFS techniques. To qualify the interatomic bonds metallicity the Fermi level (EF) position and electrons density (neff) in conduction band were determined in both undoped and doped NiAl. Basing on experimental results the physical model of GB brittleness formation was proposed.

  6. Coercivity scaling in antidot lattices in Fe, Ni, and NiFe thin films

    Energy Technology Data Exchange (ETDEWEB)

    Gräfe, Joachim, E-mail: graefe@is.mpg.de; Schütz, Gisela; Goering, Eberhard J., E-mail: goering@is.mpg.de

    2016-12-01

    Antidot lattices can be used to artificially engineer magnetic properties in thin films, however, a conclusive model that describes the coercivity enhancement in this class of magnetic nano-structures has so far not been found. We prepared Fe, Ni, and NiFe thin films and patterned each with 21 square antidot lattices with different geometric parameters and measured their hysteretic behavior. On the basis of this extensive dataset we are able to provide a model that can describe both the coercivity scaling over a wide range of geometric lattice parameters and the influence of different materials.

  7. Effect of NiAl2O4 Formation on Ni/Al2O3 Stability during Dry Reforming of Methane

    KAUST Repository

    Zhou, Lu; Li, Lidong; Wei, Nini; Li, Jun; Basset, Jean-Marie

    2015-01-01

    A series of alumina-supported Ni catalysts were prepared to examine their activity and carbon deposition during dry reforming of methane (DRM). With an increase in the final calcination temperature to T=900 °C to form exclusively NiAl2O4, a catalyst with strong metal–support interactions was obtained. During a long-term DRM reaction (of about t=100 h) at T=700 °C and with CH4/CO2=1:1, reduced Ni (from NiAl2O4) showed a high resistance to sintering and coking. The DRM kinetics behaviors of the catalysts calcined at different temperatures were also investigated. Carbon growth models were proposed to rationalize the different carbon morphologies observed on the catalysts.

  8. Effect of NiAl2O4 Formation on Ni/Al2O3 Stability during Dry Reforming of Methane

    KAUST Repository

    Zhou, Lu

    2015-07-16

    A series of alumina-supported Ni catalysts were prepared to examine their activity and carbon deposition during dry reforming of methane (DRM). With an increase in the final calcination temperature to T=900 °C to form exclusively NiAl2O4, a catalyst with strong metal–support interactions was obtained. During a long-term DRM reaction (of about t=100 h) at T=700 °C and with CH4/CO2=1:1, reduced Ni (from NiAl2O4) showed a high resistance to sintering and coking. The DRM kinetics behaviors of the catalysts calcined at different temperatures were also investigated. Carbon growth models were proposed to rationalize the different carbon morphologies observed on the catalysts.

  9. In-situ observation of equilibrium transitions in Ni films; agglomeration and impurity effects

    Energy Technology Data Exchange (ETDEWEB)

    Thron, Andrew M., E-mail: AMThron@lbl.gov [Department of Chemical Engineering and Materials Science, University of California, Davis, CA 95616 (United States); Greene, Peter; Liu, Kai [Department of Physics, University of California, Davis, CA 95616 (United States); Benthem, Klaus van [Department of Chemical Engineering and Materials Science, University of California, Davis, CA 95616 (United States)

    2014-02-01

    Dewetting of ultra-thin Ni films deposited on SiO{sub 2} layers was observed, in cross-section, by in situ scanning transmission electron microscopy. Holes were observed to nucleate by voids which formed at the Ni/SiO{sub 2} interface rather than at triple junctions at the free surface of the Ni film. Ni islands were observed to retract, in attempt to reach equilibrium on the SiO{sub 2} layer. SiO{sub 2} layers with 120 nm thickness were found to limit in situ heating experiments due to poor thermal conductivity of SiO{sub 2}. The formation of graphite was observed during the agglomeration of ultra-thin Ni films. Graphite was observed to wet both the free surface and the Ni/SiO{sub 2} interface of the Ni islands. Cr forms surface oxide layers on the free surface of the SiO{sub 2} layer and the Ni islands. Cr does not prevent the dewetting of Ni, however it will likely alter the equilibrium shape of the Ni islands. - Highlights: • In Situ observation of dewetting in ultra-thin Ni films sputtered on SiO{sub 2} layers. • Dewetting is observed in an edge-on position by in situ STEM. • Characterization of interface structure pre and post in situ annealing by STEM and EELS. • Analyze the effects of Cr{sub 1−x}O{sub x} and graphite impurities on the Ni film agglomeration. • Examine influence of the SiO{sub 2} layers on the dewetting process.

  10. Mechanical and shape memory properties of ferromagnetic Ni2MnGa sputter-deposited films

    Science.gov (United States)

    Ohtsuka, M.; Matsumoto, M.; Itagaki, K.

    2003-10-01

    The ternary intermetallic compound Ni2MnGa is an intelligent material, which has a shape memory effect and a ferromagnetic property. Use of shape memory alloy films for an actuator of micro machines is very attractive because of its large recovery force. The data of mechanical and shape memory properties of the films are required to use for the actuator. The purpose of this study is to investigate the effects of fabrication conditions and to clarify the relationships between these properties and fabrication conditions of the Ni{2}MnGa films. The Ni{2}MnGa films were deposited with a radio-frequency magnetron sputtering apparatus using a Ni{50}Mn{25}Ga{25} or Ni{52}Mn{24}Ga{24} target. After deposition, the films were annealed at 873sim 1173 K. The asdeposited films were crystalline and had columnar grains. After the heat treatment, the grains widened and the grain boundary became indistinct with increasing heat treatment temperature. MnO and Ni{3} (Mn, Ga) precipitations were observed in the heat-treated films. The mechanical properties of the films were measured by the nanoindentation method. Hardness and elastic modulus of as-deposited films were larger than those of arcmelted bulk alloys. The hardness of the films was affected by the composition, crystal structure, microstructure and precipitation, etc. The elastic modulus of the films was also changed with the heat treatment conditions. The heat-treated films showed a thermal two-way shape memory effect.

  11. Oxidation behavior of NiCoCrAlY coatings deposited by double-Glow plasma alloying

    Science.gov (United States)

    Cui, Shiyu; Miao, Qiang; Liang, Wenping; Li, Baiqiang

    2018-01-01

    The NiCoCrAlY coatings were deposited on the Inconel 718 alloy substrates by a novel method called double-glow plasma alloying (DG). The phases and microstructure of the coatings were investigated by X-ray diffraction analysis while their chemical composition was analyzed using scanning electron microscopy. The morphology of the NiCoCrAlY coatings was typical of coatings formed by DG, with their structure consisting of uniform submicron-sized grains. Further, the coatings showed high adhesion strength (critical load >46 N). In addition, the oxidation characteristics of the coatings and the substrate were examined at three different temperatures (850, 950, and 1050 °C) using a muffle furnace. The coatings showed a lower oxidation rate, which was approximately one-tenth of that of the substrate. Even after oxidation for 100 h, the Al2O3 phase was the primary phase in the surface coating (850 °C), with the thickness of the oxide film increasing to 0.65 μm at 950 °C. When the temperature was increased beyond 1050 °C, the elemental Al and Ni were consumed in the formation of the oxide scale, which underwent spallation at several locations. The oxidation products of Cr, which were produced in large amounts and had a prism-like structure, controlled the subsequent oxidation behavior at the surface.

  12. Femtosecond laser ablation and nanoparticle formation in intermetallic NiAl

    Energy Technology Data Exchange (ETDEWEB)

    Jorgensen, David J., E-mail: davidjjorgensen@engr.ucsb.edu; Titus, Michael S.; Pollock, Tresa M.

    2015-10-30

    Highlights: • The single-pulse fs laser ablation threshold of NiAl is 83 mJ/cm{sup 2}. • The transition between low- and high-fluence ablation regimes is 2.8 J/cm{sup 2}. • A bimodal size distribution of nanoparticles is formed with fs laser ablation. • Smaller nanoparticles are enriched in Al during pulsed fs laser ablation. • The target surface is depleted in Al during pulsed fs laser ablation. - Abstract: The ablation behavior of a stoichiometric intermetallic compound β-NiAl subjected to femtosecond laser pulsing in air has been investigated. The single-pulse ablation threshold for NiAl was determined to be 83 ± 4 mJ/cm{sup 2} and the transition to the high-fluence ablation regime occurred at 2.8 ± 0.3 J/cm{sup 2}. Two sizes of nanoparticles consisting of Al, NiAl, Ni{sub 3}Al and NiO were formed and ejected from the target during high-fluence ablation. Chemical analysis revealed that smaller nanoparticles (1–30 nm) tended to be rich in Al while larger nanoparticles (>100 nm) were lean in Al. Ablation in the low-fluence regime maintained this trend. Redeposited material and nanoparticles remaining on the surface after a single 3.7 J/cm{sup 2} pulse, one hundred 1.7 J/cm{sup 2} pulses, or one thousand 250 mJ/cm{sup 2} pulses were enriched in Al relative to the bulk target composition. Further, the surface of the irradiated high-fluence region was depleted in Al indicating that the fs laser ablation removal rate of the intermetallic constituents in this regime does not scale with the individual pure element ablation thresholds.

  13. Electroless deposition of NiCrB diffusion barrier layer film for ULSI-Cu metallization

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Yuechun [School of Materials Science and Engineering, Yunnan University, Kunming (China); Chen, Xiuhua, E-mail: chenxh@ynu.edu.cn [School of Materials Science and Engineering, Yunnan University, Kunming (China); Ma, Wenhui [National Engineering Laboratory of Vacuum Metallurgy, Kunming University of Science and Technology, Kunming (China); Shang, Yudong; Lei, Zhengtao; Xiang, Fuwei [School of Materials Science and Engineering, Yunnan University, Kunming (China)

    2017-02-28

    Highlights: • In this paper, the electroless deposited NiCrB thin film was mainly in the form of NiB, CrB{sub 2} compounds and elementary Ni. • The sheet resistance of NiCrB thin film was 3.043 Ω/□, it is smaller than that of the widely used Ta, TaN and TiN diffusion barrier layers. • Annealing experiments showed that the failure temperature of NiCrB thin film regarding Cu diffusion was 900 °C. • NiCrB barrier layer crystallized after 900 °C annealing, Cu grains arrived at Si-substrate through grain boundaries, resulting in the formation of Cu{sub 3}Si. • Eelectroless deposited NiCrB film also had good oxidation resistance, it is expected to become an anti-oxidant layer of copper interconnection. - Abstract: NiCrB films were deposited on Si substrates using electroless deposition as a diffusion barrier layer for Cu interconnections. Samples of the prepared NiCrB/SiO{sub 2}/Si and NiCrB/Cu/NiCrB/SiO{sub 2}/Si were annealed at temperatures ranging from 500 °C to 900 °C. The reaction mechanism of the electroless deposition of the NiCrB film, the failure temperature and the failure mechanism of the NiCrB diffusion barrier layer were investigated. The prepared samples were subjected to XRD, XPS, FPP and AFM to determine the phases, composition, sheet resistance and surface morphology of samples before and after annealing. The results of these analyses indicated that the failure temperature of the NiCrB barrier film was 900 °C and the failure mechanism led to crystallization and grain growth of the NiCrB barrier layer after high temperature annealing. It was found that this process caused Cu grains to reach Si substrate through the grain boundaries, and then the reaction between Cu and Si resulted in the formation of highly resistive Cu{sub 3}Si.

  14. Thermal stability and primary phase of Al-Ni(Cu)-La amorphous alloys

    International Nuclear Information System (INIS)

    Huang Zhenghua; Li Jinfu; Rao Qunli; Zhou Youhe

    2008-01-01

    Thermal stability and primary phase of Al 85+x Ni 9-x La 6 (x = 0-6) and Al 85 Ni 9-x Cu x La 6 (x = 0-9) amorphous alloys were investigated by X-ray diffraction and differential scanning calorimeter. It is revealed that replacing Ni in the Al 85 Ni 9 La 6 alloy by Cu decreases the thermal stability and makes the primary phase change from intermetallic compounds to single fcc-Al as the Cu content reaches and exceeds 4 at.%. When the Ni and La contents are fixed, replacing Al by Cu increases the thermal stability but also promotes the precipitation of single fcc-Al as the primary phase

  15. Hydrogen storage properties of LaMgNi3.6M0.4 (M = Ni, Co, Mn, Cu, Al) alloys

    International Nuclear Information System (INIS)

    Yang, Tai; Zhai, Tingting; Yuan, Zeming; Bu, Wengang; Xu, Sheng; Zhang, Yanghuan

    2014-01-01

    Highlights: • La–Mg–Ni system AB 2 -type alloys were prepared by induction melting. • Structures and lattice parameters were analysed by XRD. • Hydrogen absorption/desorption performances were studied. • Mechanisms of hydrogen absorption capacity fading were investigated. - Abstract: LaMgNi 3.6 M 0.4 (M = Ni, Co, Mn, Cu, Al) alloys were prepared through induction melting process. The phase compositions and crystal structures were characterised via X-ray diffraction (XRD). The hydrogen storage properties, including activation performance, hydrogen absorption capacity, cycle stability, alloy particle pulverisation and plateau pressure, were systemically investigated. Results show that Ni, Co, Mn and Cu substitution alloys exhibit multiphase structures comprising the main phase LaMgNi 4 and the secondary phase LaNi 5 . However, the secondary phase of the Al substitution alloy changes into LaAlNi 4 . The lattice parameters and cell volumes of the LaMgNi 4 phase follow the order Ni < Co < Al < Cu < Mn. Activation is simplified through partial substitution of Ni with Al, Cu and Co. The hydrogen absorption capacities of all of the alloys are approximately 1.7 wt.% at the first activation process; however, they rapidly decrease with increasing cycle number. In addition, the stabilities of hydriding and dehydriding cycles decrease in the order Al > Co > Ni > Cu > Mn. Hydriding processes result in numerous cracks and amorphisation of the LaMgNi 4 phase in the alloys. The p–c isotherms were determined by a Sieverts-type apparatus. Two plateaus were observed for the Ni, Co and Al substitution alloys, whereas only one plateau was found for Mn and Cu. This result was caused by the amorphisation of the LaMgNi 4 phase during the hydriding cycles. Reversible absorption and desorption of hydrogen are difficult to achieve. Substitutions of Ni with Co, Mn, Cu and Al significantly influence the reduction of hysteresis between hydriding and dehydriding

  16. PRECIPITATION BEHAVIOR OF Co PHASES IN B2-ORDERED(Ni,Co)Al COMPOUND

    Institute of Scientific and Technical Information of China (English)

    W.H. Tian; A.L. Fan; M. Nemoto

    2002-01-01

    The precipitation behavior of Co phases in B2-ordered (Ni, Co)Al has been investigatedin terms of transmission electron microscopy. Fine precipitation off cc-Co occurs in(Ni, Co)Al by aging at temperature over 973K. The orientation relationship betweenthe fcc-Co precipitates and the B2-(Ni, Co)Al matrix follows the Kurdjumow-Sachs(K-S) orientation relation. But when the aging temperature is under 873K the Coprecipitates have a hcp crystal structure. The orientation relationship between thehcp-Co precipitates and the B2-(Ni, Co)Al matrix follows the Burgers orientation re-lation. (Ni, Co)Al is hardened appreciably by the fine precipitation of both the fcc-Coand hcp-Co phases. The temperature dependence of the yield strength of precipitate-containing B2-ordered (Ni, Co)Al was investigated by compression tests over the rangeof 298-1273K. The fine precipitation of Co phases enhances greatly the low and in-termediate temperature yield strength. When the deformation temperature was over873K, the strength of precipitate-containing (Ni, Co)Al is comparable to ternary dual-phase (Ni, Co)Al+Ni3Al alloy.

  17. Preparation of TiC/Ni3Al Composites by Upward Melt Infiltration

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    TiC/Ni3Al composites have been prepared using upward infiltration method. The densificstion was performed by both Ni3Al melt filling and TiC sintering during the infiltration. The dissolution of TiC in liquid Ni3Al has been evidenced by finding Ni3(Al,Ti)C after fast cooling in the TiC/Ni3Al composites. The dissolution may be responsible for the infiltration and sintering. Compared with downward infiltration, the upward infiltration brought about higher strength and fracture toughness and shorter infiltration time. TiC/20 vol. pct Ni3Al composite processed by upward infiltration had a flexural strength of 1476 Mpa with a statistic Weibull modulus of 20.2 and a fracture toughness of 20.4 Mpa(m). Better mechanical properties may be attributed to melt unidirectional movement in upward infiltration.

  18. Large magnetocaloric effect of GdNiAl{sub 2} compound

    Energy Technology Data Exchange (ETDEWEB)

    Dembele, S.N.; Ma, Z.; Shang, Y.F. [School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054 (China); Fu, H., E-mail: fuhao@uestc.edu.cn [School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054 (China); Balfour, E.A. [School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054 (China); Hadimani, R.L.; Jiles, D.C. [Department of Electrical and Computer Engineering, Iowa State University, Ames, IA 50011 (United States); Ames Laboratory, US Department of Energy, Ames, IA 50011 (United States); Teng, B.H.; Luo, Y. [School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054 (China)

    2015-10-01

    This paper presents the structure, magnetic properties, and magnetocaloric effect of the polycrystalline compound GdNiAl{sub 2}. Powder X-ray diffraction (XRD) measurement and Rietveld refinement revealed that GdNiAl{sub 2} alloy is CuMgAl{sub 2}-type phase structure with about 1 wt% GdNi{sub 2}Al{sub 3} secondary phase. Magnetic measurements suggest that the compound is ferromagnetic and undergoes a second-order phase transition near 28 K. The maximum value of magnetic entropy change reaches 16.0 J/kg K for an applied magnetic field change of 0–50 kOe and the relative cooling power was 6.4×10{sup 2} J/kg. It is a promising candidate as a magnetocaloric material working near liquid hydrogen temperature (~20 K) exhibiting large relative cooling power. - Highlights: • Preferred orientation with axis of [010] was found in the GdNiAl{sub 2} compound. • The ΔS{sub Mmax} and the RCP are 16.0 J/kg K and 640 J/kg, respectively, for ΔH=50 kOe. • Relative low rare earth content in GdNiAl{sub 2} comparing with other candidates.

  19. Ni-Cr thin film resistor fabrication for GaAs monolithic microwave integrated circuits

    International Nuclear Information System (INIS)

    Vinayak, Seema; Vyas, H.P.; Muraleedharan, K.; Vankar, V.D.

    2006-01-01

    Different Ni-Cr alloys were sputter-deposited on silicon nitride-coated GaAs substrates and covered with a spin-coated polyimide layer to develop thin film metal resistors for GaAs monolithic microwave integrated circuits (MMICs). The contact to the resistors was made through vias in the polyimide layer by sputter-deposited Ti/Au interconnect metal. The variation of contact resistance, sheet resistance (R S ) and temperature coefficient of resistance (TCR) of the Ni-Cr resistors with fabrication process parameters such as polyimide curing thermal cycles and surface treatment given to the wafer prior to interconnect metal deposition has been studied. The Ni-Cr thin film resistors exhibited lower R S and higher TCR compared to the as-deposited Ni-Cr film that was not subjected to thermal cycles involved in the MMIC fabrication process. The change in resistivity and TCR values of Ni-Cr films during the MMIC fabrication process was found to be dependent on the Ni-Cr alloy composition

  20. Deposition and characterization of ZnO/NiO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Vijayaprasath, G.; Sakthivel, P.; Murugan, R.; Ravi, G., E-mail: raviganesa@rediffmail.com, E-mail: gravicrc@gmail.com [Department of Physics, Alagappa University, Karaikudi – 630 004 (India); Mahalingam, T. [Department of Electrical and Computer Engineering, Ajou University, Suwon 443-749 (Korea, Republic of)

    2016-05-23

    In this work, p-n heterojunctions based on p-NiO and n-ZnO composite nanostructures were successfully deposited by sol-gel spin coating method. Structural investigations indicate well aligned ZnO nanorods with hexagonal faces having a preferential orientation along the c-axis (002). Scanning electron microscopy (SEM) was used to characterize, the p-n heterostructures formed grain like spherical structure of NiO fully covered the hexagonal rods of ZnO in the NiO/ZnO thin film and elements were confirmed from EDX analysis. PL and micro-Raman spectra of the deposited films showed the variation in luminescence and structural properties due to the formation of heterojuction of NiO.

  1. NiFe epitaxial films with hcp and fcc structures prepared on bcc-Cr underlayers

    Energy Technology Data Exchange (ETDEWEB)

    Higuchi, Jumpei, E-mail: higuchi@futamoto.elect.chuo-u.ac.jp [Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo-ku, Tokyo 112-8551 (Japan); Ohtake, Mitsuru; Sato, Yoichi [Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo-ku, Tokyo 112-8551 (Japan); Kirino, Fumiyoshi [Graduate School of Fine Arts, Tokyo National University of Fine Arts and Music, 12-8 Ueno-koen, Taito-ku, Tokyo 110-8714 (Japan); Futamoto, Masaaki [Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo-ku, Tokyo 112-8551 (Japan)

    2011-09-30

    NiFe epitaxial films are prepared on Cr(211){sub bcc} and Cr(100){sub bcc} underlayers grown hetero-epitaxially on MgO single-crystal substrates by ultra-high vacuum rf magnetron sputtering. The film growth behavior and the crystallographic properties are studied by reflection high energy electron diffraction and pole figure X-ray diffraction. Metastable hcp-NiFe(11-bar 00) and hcp-NiFe(112-bar 0) crystals respectively nucleate on Cr(211){sub bcc} and Cr(100){sub bcc} underlayers, where the hcp-NiFe crystals are stabilized through hetero-epitaxial growth. The hcp-NiFe(11-bar 00) crystal is a single-crystal with the c-axis parallel to the substrate surface, whereas the hcp-NiFe(112-bar 0) crystal is a bi-crystal with the respective c-axes lying in plane and perpendicular each other. With increasing the film thickness, the hcp structure in the NiFe films starts to transform into more stable fcc structure by atomic displacement parallel to the hcp(0001) close packed plane. The resulting films consist of hcp and fcc crystals.

  2. NiFe epitaxial films with hcp and fcc structures prepared on bcc-Cr underlayers

    International Nuclear Information System (INIS)

    Higuchi, Jumpei; Ohtake, Mitsuru; Sato, Yoichi; Kirino, Fumiyoshi; Futamoto, Masaaki

    2011-01-01

    NiFe epitaxial films are prepared on Cr(211) bcc and Cr(100) bcc underlayers grown hetero-epitaxially on MgO single-crystal substrates by ultra-high vacuum rf magnetron sputtering. The film growth behavior and the crystallographic properties are studied by reflection high energy electron diffraction and pole figure X-ray diffraction. Metastable hcp-NiFe(11-bar 00) and hcp-NiFe(112-bar 0) crystals respectively nucleate on Cr(211) bcc and Cr(100) bcc underlayers, where the hcp-NiFe crystals are stabilized through hetero-epitaxial growth. The hcp-NiFe(11-bar 00) crystal is a single-crystal with the c-axis parallel to the substrate surface, whereas the hcp-NiFe(112-bar 0) crystal is a bi-crystal with the respective c-axes lying in plane and perpendicular each other. With increasing the film thickness, the hcp structure in the NiFe films starts to transform into more stable fcc structure by atomic displacement parallel to the hcp(0001) close packed plane. The resulting films consist of hcp and fcc crystals.

  3. Structural, electronic structure, and band alignment properties at epitaxial NiO/Al{sub 2}O{sub 3} heterojunction evaluated from synchrotron based X-ray techniques

    Energy Technology Data Exchange (ETDEWEB)

    Singh, S. D., E-mail: devsh@rrcat.gov.in; Das, Arijeet; Ajimsha, R. S.; Upadhyay, Anuj; Kamparath, Rajiv; Mukherjee, C.; Misra, P.; Rai, S. K.; Sinha, A. K.; Ganguli, Tapas [Raja Ramanna Centre for Advanced Technology, Indore, Madhya Pradesh 452013 (India); Nand, Mangla; Jha, S. N. [Bhabha Atomic Research Centre, Mumbai, Maharashtra 400085 (India); Shukla, D. K.; Phase, D. M. [UGC-DAE Consortium for Scientific Research, Khandwa Road, Indore, Madhya Pradesh 452017 (India)

    2016-04-28

    The valence band offset value of 2.3 ± 0.2 eV at epitaxial NiO/Al{sub 2}O{sub 3} heterojunction is determined from photoelectron spectroscopy experiments. Pulsed laser deposited thin film of NiO on Al{sub 2}O{sub 3} substrate is epitaxially grown along [111] direction with two domain structures, which are in-plane rotated by 60° with respect to each other. Observation of Pendellosung oscillations around Bragg peak confirms high interfacial and crystalline quality of NiO layer deposited on Al{sub 2}O{sub 3} substrate. Surface related feature in Ni 2p{sub 3/2} core level spectra along with oxygen K-edge soft X-ray absorption spectroscopy results indicates that the initial growth of NiO on Al{sub 2}O{sub 3} substrate is in the form of islands, which merge to form NiO layer for the larger coverage. The value of conduction band offset is also evaluated from the measured values of band gaps of NiO and Al{sub 2}O{sub 3} layers. A type-I band alignment at NiO and Al{sub 2}O{sub 3} heterojunction is also obtained. The determined values of band offsets can be useful in heterojunction based light emitting devices.

  4. Modification of magnetoresistance and magnetic properties of Ni thin films by adding Dy interlayer

    Science.gov (United States)

    Vorobiov, S. I.; Shabelnyk, T. M.; Shutylieva, O. V.; Pazukha, I. M.; Chornous, A. M.

    2018-03-01

    The paper reports the influence of dysprosium (Dy) interlayer addition on structure, magnetoresistance and magnetic properties of nickel (Ni) thin films. Trilayer film systems Ni/Dy/Ni have been prepared by alternate electron-beam evaporation. It is demonstrated that all as-prepared and annealed Ni thin films have face-centered cubic structure. The composition of the samples after addition of the Dy interlayer corresponds to the combination of face-centered cubic (Ni) and hexagonal close-packed (Dy) structures. The structure of Ni/Dy/Ni film systems changes from amorphous to polycrystalline when Dy interlayer thickness (t Dy) is more than 15 nm. The value of magnetoresistance increases with the adding the Dy interlayer in both longitudinal and transverse geometries, meanwhile the anisotropic character of magnetoresistance field dependences retained. The saturation and reversal magnetizations are reduced with the increasing of the Dy thickness interlayer, while the coercivity takes the minimum value at t Dy = 15 nm. The following increasing of t Dy leads to increasing of coercivity near to three times. This result indicates the influence of the crystal structure on the magnetic properties of Ni thin films at adding Dy interlayer.

  5. Effect of Si and Co on the crystallization of Al-Ni-RE amorphous alloys

    Energy Technology Data Exchange (ETDEWEB)

    Wang, S.H. [Key Lab of Liquid structure and Heredity of Materials, Ministry of Education, South Campus of Shandong University, Jinan 250061 (China); Bian, X.F. [Key Lab of Liquid structure and Heredity of Materials, Ministry of Education, South Campus of Shandong University, Jinan 250061 (China)], E-mail: xfbian@sdu.edu.cn

    2008-04-03

    Crystallization of Al{sub 83}Ni{sub 10}Si{sub 2}Ce{sub 5}, Al{sub 85}Ni{sub 10}Ce{sub 5}, Al{sub 87}Ni{sub 7}Nd{sub 6} and Al{sub 87}Ni{sub 5}Co{sub 2}Nd{sub 6} amorphous alloys has been studied by using X-ray diffraction (XRD) and differential scanning calorimetry (DSC). The multiple transition metal (TM) (containing metalloid element) have significant effect on the crystallization behavior. A small addition of Si transforms a eutectic crystallization (Al{sub 85}Ni{sub 10}Ce{sub 5}) to a primary crystallization (Al{sub 83}Ni{sub 10}Si{sub 2}Ce{sub 5}); while a small addition of Co transforms a primary crystallization (Al{sub 87}Ni{sub 7}Nd{sub 6}) to a eutectic crystallization (Al{sub 87}Ni{sub 5}Co{sub 2}Nd{sub 6}). In addition, the activation energies for crystallization (E{sub a}) are obtained to be 191, 290, 221 and 166 kJ/mol for the Al{sub 83}Ni{sub 10}Si{sub 2}Ce{sub 5}, Al{sub 85}Ni{sub 10}Ce{sub 5}, Al{sub 87}Ni{sub 5}Co{sub 2}Nd{sub 6} and Al{sub 87}Ni{sub 7}Nd{sub 6} amorphous alloys based on the Kissinger method, respectively. It is found that the primary crystallization of fcc-Al is characteristic of a lower E{sub a}, as compared with eutectic crystallization.

  6. Influence of Ni content on physico-chemical characteristics of Ni, Mg, Al-Hydrotalcite like compounds

    Directory of Open Access Journals (Sweden)

    Alexandre Carlos Camacho Rodrigues

    2003-12-01

    Full Text Available The physico-chemical properties of a series of Ni,Mg,Al-HTLC with Al/(Al+Mg+Ni = 0.25 and low Ni/Mg ratios were studied by means of X-ray diffraction (XRD, thermogravimetric (TGA and thermodifferential (DTA analysis, N2 physissorption and temperature programmed reduction (TPR. The as-synthesized materials were well-crystallized, with XRD patterns typical of the HTLCs in carbonate form. Upon calcination and dehydration the dehydroxilation of the layers with concurrent decomposition of carbonate anions produced mixed oxides with high surface area. XRD analysis indicated that the different nickel and aluminum oxides species are well-dispersed in a poor-crystallized MgO periclase-type phase. As observed by TPR, the different Ni species showed distinct interactions with Mg(AlO phase, which were influenced by both nickel content and calcination temperature. Regardless of the the nickel content, the reduction of nickel species was not complete as indicated by the presence of metallic dispersions.

  7. Nanoscale compositional analysis of NiTi shape memory alloy films deposited by DC magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Sharma, S. K.; Mohan, S. [Centre for Nano Science and Engineering, Indian Institute of Science, Bangalore-560012 (India); Bysakh, S. [Central Glass and Ceramics Research Institute, Kolkata-700032 (India); Kumar, A.; Kamat, S. V. [Defence Metallurgical Research Laboratory, Hyderabad-500058 (India)

    2013-11-15

    The formation of surface oxide layer as well as compositional changes along the thickness for NiTi shape memory alloy thin films deposited by direct current magnetron sputtering at substrate temperature of 300 °C in the as-deposited condition as well as in the postannealed (at 600 °C) condition have been thoroughly studied by using secondary ion mass spectroscopy, x-ray photoelectron spectroscopy, and scanning transmission electron microscopy-energy dispersive x-ray spectroscopy techniques. Formation of titanium oxide (predominantly titanium dioxide) layer was observed in both as-deposited and postannealed NiTi films, although the oxide layer was much thinner (8 nm) in as-deposited condition. The depletion of Ti and enrichment of Ni below the oxide layer in postannealed films also resulted in the formation of a graded microstructure consisting of titanium oxide, Ni{sub 3}Ti, and B2 NiTi. A uniform composition of B2 NiTi was obtained in the postannealed film only below a depth of 200–250 nm from the surface. Postannealed film also exhibited formation of a ternary silicide (Ni{sub x}Ti{sub y}Si) at the film–substrate interface, whereas no silicide was seen in the as-deposited film. The formation of silicide also caused a depletion of Ni in the film in a region ∼250–300 nm just above the film substrate interface.

  8. Processing and Mechanical Properties of NiAl-Based In-Situ Composites. Ph.D. Thesis Final Report

    Science.gov (United States)

    Johnson, David Ray

    1994-01-01

    In-situ composites based on the NiAl-Cr eutectic system were successfully produced by containerless processing and evaluated. The NiAl-Cr alloys had a fibrous microstructure while the NiAl-(Cr,Mo) alloys containing 1 at. percent or more molybdenum exhibited a lamellar structure. The NiAl-28Cr-6Mo eutectic displays promising high temperature strength while still maintaining a reasonable room temperature fracture toughness when compared to other NiAl-based materials. The Laves phase NiAlTa was used to strengthen NiAl and very promising creep strengths were found for the directionally solidified NiAl-NiAlTa eutectic. The eutectic composition was found to be near NiAl-15.5Ta (at. percent) and well aligned microstructures were produced at this composition. An off-eutectic composition of NiAl-14.5Ta was also processed, consisting of NiAl dendrites surrounded by aligned eutectic regions. The room temperature toughness of these two phase alloys was similar to that of polycrystalline NiAl even with the presence of the brittle Laves phase NiAlTa. Polyphase in-situ composites were generated by directional solidification of ternary eutectics. The systems investigated were the Ni-Al-Ta-X (X=Cr, Mo, or V) alloys. Ternary eutectics were found in each of these systems and both the eutectic composition and temperature were determined. Of these ternary eutectics, the one in the NiAl-Ta-Cr system was found to be the most promising. The fracture toughness of the NiAl-(Cr,Al)NiTa-Cr eutectic was intermediate between those of the NiAl-NiAlTa eutectic and the NiAl-Cr eutectic. The creep strength of this ternary eutectic was similar to or greater than that of the NiAl-Cr eutectic.

  9. Self-Organized Ni Nanocrystal Embedded in BaTiO3 Epitaxial Film

    Directory of Open Access Journals (Sweden)

    Ge FF

    2010-01-01

    Full Text Available Abstract Ni nanocrystals (NCs were embedded in BaTiO3 epitaxial films using the laser molecular beam epitaxy. The processes involving the self-organization of Ni NCs and the epitaxial growth of BaTiO3 were discussed. With the in situ monitoring of reflection high-energy electron diffraction, the nanocomposite films were engineered controllably by the fine alternation of the self-organization of Ni NCs and the epitaxial growth of BaTiO3. The transmission electron microscopy and the X-ray diffraction characterization confirmed that the composite film consists of the Ni NCs layers alternating with the (001/(100-oriented epitaxial BaTiO3 separation layers.

  10. Nanostructure characterization of Ni and B layers as artificial pinning centers in multilayered MgB2/Ni and MgB2/B superconducting thin films

    International Nuclear Information System (INIS)

    Sosiati, H.; Hata, S.; Doi, T.; Matsumoto, A.; Kitaguchi, H.; Nakashima, H.

    2013-01-01

    Highlights: ► Nanostructure characterization of Ni and B layers as artificial pinning centers (APCs). ► Relationship between nanostructure and J c property. ► Enhanced J c in parallel field by parallel APCs within the MgB 2 film. -- Abstract: Research on the MgB 2 /Ni and MgB 2 /B multilayer films fabricated by an electron beam (EB) evaporation technique have been extensively carried out. The critical current density, J c of MgB 2 /Ni and MgB 2 /B multilayer films in parallel fields has been suggested to be higher than that of monolayer MgB 2 film due to introducing the artificial pinning centers of nano-sized Ni and B layers. Nanostructure characterization of the artificial pinning centers in the multilayer films were examined by transmission electron microscopy (TEM) and scanning TEM (STEM-energy dispersive X-ray spectroscopy (STEM-EDS))–EDS to understand the mechanism of flux pinning. The growth of columnar MgB 2 grains along the film-thickness direction was recognized in the MgB 2 /Ni multilayer film, but not in the MgB 2 /B multilayer film. Nano-sized Ni layers were present as crystalline epitaxial layers which is interpreted that Ni atoms might be incorporated into the MgB 2 lattice to form (Mg,Ni)B 2 phase. On the other hand, nano-sized B layers were amorphous layers. Crystalline (Mg,Ni)B 2 layers worked more effectively than amorphous B-layers, providing higher flux-pinning force that resulted in higher J c of the MgB 2 /Ni multilayer film than the MgB 2 /B multilayer film

  11. Fast diffusion and nucleation of the amorphous phase in Ni--Zr films

    International Nuclear Information System (INIS)

    Ehrhart, P.; Averback, R.S.; Hahn, H.; Yadavalli, S.; Flynn, C.P.

    1988-01-01

    The nucleation of the amorphous phase by solid-state reactions has been investigated on single-crystal Zr films grown by molecular beam epitaxy and covered in situ with either polycrystalline Ni, amorphous (a-) NiZr, or single-crystalline Zr 99 N 01 films. Interfacial reactions were investigated by backscattering analysis or secondary ion mass spectroscopy. The amorphizing reaction occurred only in the specimen with the a-NiZr overlayer, although fast Ni diffusion through the single-crystalline Zr layer was observed in all three specimens. The nucleation behavior of a-NiZr is attributed to the combination of high-Ni and low-Zr mobility in crystalline Zr

  12. Ultraviolet light-absorbing and emitting diodes consisting of a p-type transparent-semiconducting NiO film deposited on an n-type GaN homoepitaxial layer

    Science.gov (United States)

    Nakai, Hiroshi; Sugiyama, Mutsumi; Chichibu, Shigefusa F.

    2017-05-01

    Gallium nitride (GaN) and related (Al,Ga,In)N alloys provide practical benefits in the production of light-emitting diodes (LEDs) and laser diodes operating in ultraviolet (UV) to green wavelength regions. However, obtaining low resistivity p-type AlN or AlGaN of large bandgap energies (Eg) is a critical issue in fabricating UV and deep UV-LEDs. NiO is a promising candidate for useful p-type transparent-semiconducting films because its Eg is 4.0 eV and it can be doped into p-type conductivity of sufficiently low resistivity. By using these technologies, heterogeneous junction diodes consisting of a p-type transparent-semiconducting polycrystalline NiO film on an n-type single crystalline GaN epilayer on a low threading-dislocation density, free-standing GaN substrate were fabricated. The NiO film was deposited by using the conventional RF-sputtering method, and the GaN homoepitaxial layer was grown by metalorganic vapor phase epitaxy. They exhibited a significant photovoltaic effect under UV light and also exhibited an electroluminescence peak at 3.26 eV under forward-biased conditions. From the conduction and valence band (EV) discontinuities, the NiO/GaN heterointerface is assigned to form a staggered-type (TYPE-II) band alignment with the EV of NiO higher by 2.0 eV than that of GaN. A rectifying property that is consistent with the proposed band diagram was observed in the current-voltage characteristics. These results indicate that polycrystalline NiO functions as a hole-extracting and injecting layer of UV optoelectronic devices.

  13. In-situ observation of equilibrium transitions in Ni films; agglomeration and impurity effects.

    Science.gov (United States)

    Thron, Andrew M; Greene, Peter; Liu, Kai; van Benthem, Klaus

    2014-02-01

    Dewetting of ultra-thin Ni films deposited on SiO2 layers was observed, in cross-section, by in situ scanning transmission electron microscopy. Holes were observed to nucleate by voids which formed at the Ni/SiO2 interface rather than at triple junctions at the free surface of the Ni film. Ni islands were observed to retract, in attempt to reach equilibrium on the SiO2 layer. SiO2 layers with 120 nm thickness were found to limit in situ heating experiments due to poor thermal conductivity of SiO2. The formation of graphite was observed during the agglomeration of ultra-thin Ni films. Graphite was observed to wet both the free surface and the Ni/SiO2 interface of the Ni islands. Cr forms surface oxide layers on the free surface of the SiO2 layer and the Ni islands. Cr does not prevent the dewetting of Ni, however it will likely alter the equilibrium shape of the Ni islands. © 2013 Published by Elsevier B.V.

  14. Effect of low and high heating rates on reaction path of Ni(V)/Al multilayer

    Energy Technology Data Exchange (ETDEWEB)

    Maj, Łukasz, E-mail: l.maj@imim.pl [Institute of Metallurgy and Materials Science, Polish Academy of Sciences, 25 Reymonta St., 30-059 Kraków (Poland); Morgiel, Jerzy; Szlezynger, Maciej [Institute of Metallurgy and Materials Science, Polish Academy of Sciences, 25 Reymonta St., 30-059 Kraków (Poland); Bała, Piotr; Cios, Grzegorz [AGH University of Science and Technology, Academic Centre for Materials and Nanotechnology, 30 Kawiory St., 30-055 Kraków (Poland)

    2017-06-01

    The effect of heating rates of Ni(V)/Al NanoFoils{sup ®} was investigated with transmission electron microscopy (TEM). The Ni(V)/Al were subjected to heating by using differential scanning calorimetry (DSC), in-situ TEM or electric pulse. Local chemical analysis was carried out using energy dispersive X-ray spectroscopy (EDS). Phase analysis was done with X-ray diffractions (XRD) and selected area electron diffractions (SAED). The experiments showed that slow heating in DSC results in development of separate exothermic effects at ∼230 °C, ∼280 °C and ∼390 °C, corresponding to precipitation of Al{sub 3}Ni, Al{sub 3}Ni{sub 2} and NiAl phases, respectively, i.e. like in vanadium free Ni/Al multilayers. Further heating to 700 °C allowed to obtain a single phase NiAl foil. The average grain size (g.s.) of NiAl phase produced in the DSC heat treated foil was comparable with the Ni(V)/Al multilayer period (∼50 nm), whereas in the case of reaction initiated with electric pulse the g.s. was in the micrometer range. Upon slow heating vanadium tends to segregate to zones parallel to the original multilayer internal interfaces, while in SHS process vanadium-rich phases precipitates at grain boundaries of the NiAl phase. - Highlights: • Peaks in DSC heating of Ni(V)/Al were explained by in-situ TEM observations. • Nucleation of Al{sub 3}Ni, Al{sub 3}Ni{sub 2} and NiAl at slow heating of Ni(V)/Al was documented. • Near surface NiAl obtained from NanoFoil show Ag precipitates at grain boundaries.

  15. Synthesis and characterization of Cu–Al–Ni shape memory alloy multilayer thin films

    International Nuclear Information System (INIS)

    Gómez-Cortés, J.F.; San Juan, J.; López, G.A.; Nó, M.L.

    2013-01-01

    Among active materials, shape memory alloys are well recognized for their work output density. Because of that, these alloys have attracted much attention to be used in micro/nano electromechanical systems. In the present work, the electron beam evaporation technique has been used to growth, by a multilayer method, two shape memory alloy thin films with different Cu–Al–Ni composition. Multilayers have been further thermally treated to produce the alloys by solid solution diffusion. The produced multilayers have been characterized and the presence of the martensite phase in the obtained thin films was studied. Furthermore, the influence of two different coatings onto the Si substrates, namely Si/SiO 2 and Si/Si 3 N 4 , was investigated. Mechanically stable, not detaching from the substrates, Cu–Al–Ni shape memory alloy thin films, about 1 micrometre thick, showing a martensitic transformation have been produced. - Highlights: ► Multilayer thin films of Cu–Al–Ni shape memory alloys produced by e-beam evaporation. ► SiN X 200 nm thick coating is good for high quality Cu–Al–Ni shape memory thin films. ► Thermal treatment renders Cu–Al–Ni multilayer in homogeneous martensite thin film

  16. Anisotropic ferromagnetic behaviors in highly orientated epitaxial NiO-based thin films

    Directory of Open Access Journals (Sweden)

    Yu-Jun Zhang

    2015-07-01

    Full Text Available Antiferromagnetic materials attract a great amount of attention recently for promising antiferromagnet-based spintronics applications. NiO is a conventional antiferromagnetic semiconductor material and can show ferromagnetism by doping other magnetic elements. In this work, we synthesized epitaxial Fe-doped NiO thin films on SrTiO3 substrates with various crystal orientations by pulsed laser deposition. The room-temperature ferromagnetism of these films is anisotropic, including the saturated magnetization and the coercive field. The anisotropic magnetic behaviors of Fe-doped NiO diluted magnetic oxide system should be closely correlated to the magnetic structure of antiferromagnetic NiO base. Within the easy plane of NiO, the coercive field of the films becomes smaller, and larger coercive field while tested out of the easy plane of NiO. The saturated magnetization anisotropy is due to different strain applied by different substrates. These results lead us to more abundant knowledge of the exchange interactions in this conventional antiferromagnetic system.

  17. Thermodynamic analysis of (Ni, Fe)3Al formation by mechanical alloying

    International Nuclear Information System (INIS)

    Adabavazeh, Z.; Karimzadeh, F.; Enayati, M.H.

    2012-01-01

    Highlights: ► (Ni, Fe) 3 Al intermetallic compound was synthesized by mechanical alloying. ► We use a thermodynamic analysis to predict the more stable phase. ► We calculate the Gibbs free-energy changes by using extended Miedema model. ► The results of MA compared with thermodynamic analysis and showed a good agreement with it. - Abstract: (Ni, Fe) 3 Al intermetallic compound was synthesized by mechanical alloying (MA) of Ni, Fe and Al elemental powder mixtures of composition Ni 50 Fe 25 Al 25 . Phase transformation and microstructure characteristics of the alloy powders were investigated by X-ray diffraction (XRD). The results show that mechanical alloying resulted in a Ni (Al, Fe) solid solution. By continued milling, this structure transformed to the disordered (Ni, Fe) 3 Al intermetallic compound. A thermodynamic model developed on the basis of extended theory of Miedema is used to calculate the Gibbs free-energy changes. Final product of MA is a phase having minimal Gibbs free energy compared with other competing phases in Ni–Fe–Al system. However in Ni–Fe–Al system, the most stable phase at all compositions is intermetallic compound (not amorphous phase or solid solution). The results of MA were compared with thermodynamic analysis and revealed the leading role of thermodynamic on the formation of MA product prediction.

  18. Site determination of Ni atoms in Cu-Al-Ni shape memory alloys by electron channelling enhanced microanalysis

    International Nuclear Information System (INIS)

    Nakata, Yoshiyuki; Tadaki, Tsugio; Shimizu, Ken-ichi

    1990-01-01

    The crystallographic site of Ni atoms in the parent phase of differently heat-treated Cu-28.6Al-3.7Ni (at.%) shape memory alloys has been examined by electron channelling enhanced microanalysis (ALCHEMI) in order to clarify effects of heat-treatments on the Ni atom site and M s temperature. The heat-treatments were as follows: (a) Quenching into a 10% NaOH solution at 263 K, (b) Quenching into hot water at 363 K and (c) Aging at 523 K for 3.6 ks after treatment (b). The M s temperatures of specimens (a), (b) and (c) were 158, 185 and 259 K, respectively, increasing with lowering quenching rate or aging. ALCHEMI revealed that Ni atoms occupied an identical site in all the three kinds of specimens: The Ni atoms were located at the nearest neighbor sites around Al atoms. This preferential occupation of Ni atoms was attributed to the strong binding force between Ni and Al atoms. Thus, the change in M s temperature due to different heat-treatments was not directly related to the crystallographic site of Ni atoms, but might be caused by the ordering between the next nearest neighbor Cu and Al atoms. (author)

  19. Structural, mechanical and magnetic study on galvanostatic electroplated nanocrystalline NiFeP thin films

    Science.gov (United States)

    Kalaivani, A.; Senguttuvan, G.; Kannan, R.

    2018-03-01

    Nickel based alloys has a huge applications in microelectronics and micro electromechanical systems owing to its superior soft magnetic properties. With the advantages of simplicity, cost-effectiveness and controllable patterning, electroplating processes has been chosen to fabricate thin films in our work. The soft magnetic NiFeP thin film was successfully deposited over the surface of copper plate through galvanostatic electroplating method by applying constant current density of 10 mA cm-2 for a deposition rate for half an hour. The properties of the deposited NiFeP thin films were analyzed by subjecting it into different physio-chemical characterization such as XRD, SEM, EDAX, AFM and VSM. XRD pattern confirms the formation of NiFeP particles and the structural analysis reveals that the NiFeP particles were uniformly deposited over the surface of copper substrate. The surface roughness analysis of the NiFeP films was done using AFM analysis. The magnetic studies and the hardness of the thin film were evaluated from the VSM and hardness test. The NiFeP thin films possess lower coercivity with higher magnetization value of 69. 36 × 10-3 and 431.92 Gauss.

  20. STM-Induced Void Formation at the Al{sub 2}O{sub 3}/Ni{sub 3}Al(111) Interface

    Energy Technology Data Exchange (ETDEWEB)

    Magtoto, N.P.; Niu, C.; Anzaldura, M.; Kelber, J.A.; Jennison, D.R.

    2000-09-21

    Under UHV conditions at 300 K, the applied electric field and/or resulting current from an STM tip creates nanoscale voids at the interface between an epitaxial, 7.0 {angstrom} thick Al{sub 2}O{sub 3} film and a Ni{sub 3}Al(111) substrate. This phenomenon is independent of tip polarity. Constant current (1 nA) images obtained at +0.1 V bias and +2.0 bias voltage (sample positive) reveal that voids are within the metal at the interface and, when small, are capped by the oxide film. Void size increases with time of exposure. The rate of void growth increases with applied bias/field and tunneling current, and increases significantly for field strengths >5 MV/cm, well below the dielectric breakdown threshold of 12 {+-} 1 MV/cm. Slower rates of void growth are, however, observed at lower applied field strengths. Continued growth of voids, to {approximately}30 {angstrom} deep and {approximately}500 {angstrom} wide, leads to the eventual failure of the oxide overlayer. Density Functional Theory calculations suggest a reduction-oxidation (REDOX) mechanism: interracial metal atoms are oxidized via transport into the oxide, while oxide surface Al cations are reduced to admetal species which rapidly diffuse away. This is found to be exothermic in model calculations, regardless of the details of the oxide film structure; thus, the barriers to void formation are kinetic rather than thermodynamic. We discuss our results in terms of mechanisms for the localized pitting corrosion of aluminum, as our results suggest nanovoid formation requires just electric field and current, which are ubiquitous in environmental conditions.

  1. Structural, electrical and magnetic properties of evaporated Ni/Cu and Ni/glass thin films

    Energy Technology Data Exchange (ETDEWEB)

    Nacereddine, C. [Departement de Physique, Universite Ferhat Abbas, Setif 19000 (Algeria); Layadi, A. [Departement de Physique, Universite Ferhat Abbas, Setif 19000 (Algeria)]. E-mail: A_Layadi@yahoo.fr; Guittoum, A. [Centre de Recherche Nucleaire d' Alger (CRNA), Alger 16000 (Algeria); Cherif, S.-M. [Laboratoire PMTM, Institut Galilee, Univeriste Paris 13, Villetaneuse 93340 (France); Chauveau, T. [Laboratoire PMTM, Institut Galilee, Univeriste Paris 13, Villetaneuse 93340 (France); Billet, D. [Laboratoire PMTM, Institut Galilee, Univeriste Paris 13, Villetaneuse 93340 (France); Youssef, J. Ben [Laboratoire de Magnetisme de Bretagne, U.B.O., Brest 29238 (France); Bourzami, A. [Departement de Physique, Universite Ferhat Abbas, Setif 19000 (Algeria); Bourahli, M.-H. [Departement d' O. M. P., Universite Ferhat Abbas, Setif 19000 (Algeria)

    2007-01-25

    The structural, electrical and magnetic properties of Ni thin films evaporated onto glass and polycrystalline Cu substrates have been investigated. The Ni thickness ranges from 31 to 165 nm. X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) have been used to study the structure and morphology of these systems. The Ni/Cu and Ni/glass thin films are found to be polycrystalline with a (1 1 1) texture. There is an overall increase of the grain size with increasing thickness. A negative strain was noted indicating that all the samples are under a compressive stress. Diffusion at the grain boundaries seems to be a major contribution to the electrical resistivity in this thickness range. Study of the hysteresis curves, obtained by vibrating sample magnetometer (VSM), indicates that all samples are characterized by an in-plane magnetization easy axis. Higher in-plane coercive fields seem to be associated with higher grain size, indicating that coercivity may be due to nucleation of reverse domains rather than pinning of domain walls. The saturation field and the squareness have been studied as a function of the Ni thickness.

  2. TI--CR--AL--O thin film resistors

    Science.gov (United States)

    Jankowski, Alan F.; Schmid, Anthony P.

    2000-01-01

    Thin films of Ti--Cr--Al--O are used as a resistor material. The films are rf sputter deposited from ceramic targets using a reactive working gas mixture of Ar and O.sub.2. Resistivity values from 10.sup.4 to 10.sup.10 Ohm-cm have been measured for Ti--Cr--Al--O film Ti--Cr--Al--O as a thin film resistor has been found to be thermodynamically stable, unlike other metal-oxide films. The Ti--Cr--Al--O film can be used as a vertical or lateral resistor, for example, as a layer beneath a field emission cathode in a flat panel display; or used to control surface emissivity, for example, as a coating on an insulating material such as vertical wall supports in flat panel displays.

  3. Evolution of rapidly solidified NiAlCu(B) alloy microstructure.

    Science.gov (United States)

    Czeppe, Tomasz; Ochin, Patrick

    2006-10-01

    This study concerned phase transformations observed after rapid solidification and annealing at 500, 700 and 800 degrees C in 56.3 Ni-39.9 Al-3.8 Cu-0.06 B (E1) and 59.8 Ni-36.0 Al-4.3 Cu-0.06 B (E2) alloys (composition in at.%). Injection casting led to a homogeneous structure of very small, one-phase grains (2-4 microm in size). In both alloys, the phase observed at room temperature was martensite of L1(0) structure. The process of the formation of the Ni(5)Al(3) phase by atomic reordering proceeded at 285-394 degrees C in the case of E1 alloy and 450-550 degrees C in the case of E2 alloy. Further decomposition into NiAl (beta) and Ni(3)Al (gamma') phases, the microstructure and crystallography of the phases depended on the path of transformations, proceeding in the investigated case through the transformation of martensite crystallographic variants. This preserved precise crystallographic orientation between the subsequent phases, very stable plate-like morphology and very small beta + gamma' grains after annealing at 800 degrees C.

  4. High-rate sputter deposition of NiAl on sapphire fibers

    Energy Technology Data Exchange (ETDEWEB)

    Reichert, K.; Martinez, C.; Cremer, R.; Neuschuetz, D. [Lehrstuhl fuer Theoretische Huettenkunde, RWTH Aachen, Aachen (Germany)

    2002-07-01

    Once the fiber-matrix bonding has been optimized to meet the different requirements during fabrication and operation of the later composite component, sapphire fiber reinforced NiAl will be a potential candidate to substitute conventional superalloys as structural material for gas turbine blades. To improve the composite fabrication process, a direct deposition of the intermetallic matrix material onto hBN coated sapphire fibers prior to the consolidation of the fiber-matrix composite is proposed. It is believed that this will simplify the fabrication process and prevent pore formation during the diffusion bonding. In addition, the fiber volume fraction can be quite easily adjusted by varying the NiAl coating thickness. For this, a high-rate deposition of NiAl is in any case necessary. It has been achieved by a pulsed DC magnetron sputtering of combined Al-Ni targets with the fibers rotating between the two facing cathodes. The obtained nickel aluminide coatings were analyzed as to structure and composition by means of X-ray (GIXRD) as well as electron diffraction (RHEED) and X-ray photoelectron spectroscopy (XPS), respectively. The morphology of the NiAl coatings was examined by SEM. (orig.)

  5. Creep Properties of NiAl-1Hf Single Crystals Re-Investigated

    Science.gov (United States)

    Whittenberger, J. Daniel; Locci, Ivan E.; Darolia, Ram; Bowman, Randy R.

    2000-01-01

    NiAl-1Hf single crystals have been shown to be quite strong at 1027 C, with strength levels approaching those of advanced Ni-based superalloys. Initial testing, however, indicated that the properties might not be reproducible. Study of the 1027 C creep behavior of four different NiAl-1Hf single-crystal ingots subjected to several different heat treatments indicated that strength lies in a narrow band. Thus, we concluded that the mechanical properties are reproducible. Recent investigations of the intermetallic NiAl have confirmed that minor alloying additions combined with single-crystal growth technology can produce elevated temperature strength levels approaching those of Ni-based superalloys. For example, General Electric alloy AFN 12 {Ni-48.5(at.%) Al-0.5Hf-1Ti-0.05Ga} has a creep rupture strength equivalent to Rene 80 combined with a approximately 30-percent lower density, a fourfold improvement in thermal conductivity, and the ability to form a self-protective alumina scale in aggressive environments. Although the compositions of strong NiAl single crystals are relatively simple, the microstructures are complex and vary with the heat treatment and with small ingot-toingot variations in the alloy chemistry. In addition, initial testing suggested a strong dependence between microstructure and creep strength. If these observations were true, the ability to utilize NiAl single-crystal rotating components in turbine machinery could be severely limited. To investigate the possible limitations in the creep response of high-strength NiAl single crystals, the NASA Glenn Research Center at Lewis Field initiated an in depth investigation of the effect of heat treatment on the microstructure and subsequent 1027 C creep behavior of [001]-oriented NiAl-1Hf with a nominal chemistry of Ni-47.5Al-1Hf-0.5Si. This alloy was selected since four ingots, grown over a number of years and possessing slightly different compositions, were available for study. Specimens taken from the

  6. Fabrication and structure of bulk nanocrystalline Al-Si-Ni-mishmetal alloys

    International Nuclear Information System (INIS)

    Latuch, Jerzy; Cieslak, Grzegorz; Kulik, Tadeusz

    2007-01-01

    Al-based alloys of structure consisting of nanosized Al crystals, embedded in an amorphous matrix, are interesting for their excellent mechanical properties, exceeding those of the commercial crystalline Al-based alloys. Recently discovered nanocrystalline Al alloys containing silicon (Si), rare earth metal (RE) and late transition metal (Ni), combine high tensile strength and good wear resistance. The aim of this work was to manufacture bulk nanocrystalline alloys from Al-Si-Ni-mishmetal (Mm) system. Bulk nanostructured Al 91-x Si x Ni 7 Mm 2 (x = 10, 11.6, 13 at.%) alloys were produced by ball milling of nanocrystalline ribbons followed by high pressure hot isostating compaction

  7. Effect of Ni content on microwave absorbing properties of MnAl powder

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Zhen-zhong; Lin, Pei-hao, E-mail: gllph2002@163.com; Huang, Wei-chao; Pan, Shun-kang; Liu, Ye; Wang, Lei

    2016-09-01

    MnAlNi powder was prepared by the process of vacuum levitation melting and high-energy ball milling, The morphology and phase structure of the powder were analyzed by Scanning Electron Microscope(SEM), X-ray diffraction(XRD) and the effect of the Ni content on microwave absorbing properties of MnAl powder was investigated by an vector network analyzer. The addition of Ni, which improved the microwave absorbing properties of MnAl powder but not changed the composition of Al{sub 8}Mn{sub 5} alloy. The minimum reflectivity of (Al{sub 8}Mn{sub 5}){sub 0.95}Ni{sub 0.05} powder with a coating thickness (d) of 1.8 mm was about −40.8 dB and has better bandwidth effect, the absorbing mechanism of AlMnNi powders on the electromagnetic was related to the electromagnetic loss within the absorbing coatings and the effect of coating thickness on the interference loss of electromagnetic wave. - Highlights: • The grain size and cell volume of Al{sub 8}Mn{sub 5} alloy phase were decreased with the increasing of Ni. • ε″ and μ″ of powder moves toward low frequency region at the beginning then moves high. • The minimum reflectivity of (Al{sub 8}Mn{sub 5}){sub 0.95}Ni{sub 0.05} powder was −40.8 dB with 1.8 mm thickness. • The lowest reflection loss peak of (Al{sub 8}Mn{sub 5}){sub 0.95}Ni{sub 0.05} was −46.3 dB with 2.2 mm thickness.

  8. CLASSICAL AREAS OF PHENOMENOLOGY: First-principles calculations for the elastic properties of Ni-base model superalloys: Ni/Ni3Al multilayers

    Science.gov (United States)

    Wang, Yun-Jiang; Wang, Chong-Yu

    2009-10-01

    A model system consisting of Ni[001](100)/Ni3Al[001](100) multi-layers are studied using the density functional theory in order to explore the elastic properties of single crystal Ni-based superalloys. Simulation results are consistent with the experimental observation that rafted Ni-base superalloys virtually possess a cubic symmetry. The convergence of the elastic properties with respect to the thickness of the multilayers are tested by a series of multilayers from 2γ'+2γ to 10γ'+10γ atomic layers. The elastic properties are found to vary little with the increase of the multilayer's thickness. A Ni/Ni3Al multilayer with 10γ'+10γ atomic layers (3.54 nm) can be used to simulate the mechanical properties of Ni-base model superalloys. Our calculated elastic constants, bulk modulus, orientation-dependent shear modulus and Young's modulus, as well as the Zener anisotropy factor are all compatible with the measured results of Ni-base model superalloys R1 and the advanced commercial superalloys TMS-26, CMSX-4 at a low temperature. The mechanical properties as a function of the γ' phase volume fraction are calculated by varying the proportion of the γ and γ' phase in the multilayers. Besides, the mechanical properties of two-phase Ni/Ni3Al multilayer can be well predicted by the Voigt-Reuss-Hill rule of mixtures.

  9. Effects of annealing and pulse plating on soft magnetic properties of electroplated Fe-Ni films

    Directory of Open Access Journals (Sweden)

    T. Yanai

    2016-05-01

    Full Text Available We have already reported that Fe-Ni films prepared in citric-acid-based plating baths show good soft magnetic properties. In this paper, we investigated the effect of the grain size of the Fe-Ni crystalline phase in the films on magnetic properties, and employed an annealing and a pulse plating method in order to vary the grain size. The coercivity of the annealed Fe-Ni films at 600 °C shows large value, and good correlation between the grain growth and the coercivity was observed. The pulse plating enables us to reduce the grain size of the as-plated Fe-Ni films compared with the DC plating method, and we realized smooth surface and low coercivity of the Fe-Ni films using the pulse plating method. From these results, we confirmed the importance of the reduction in the grain size, and concluded that a pulse plating is an effective method to improve the good soft magnetic properties for our previously-reported Fe-Ni films.

  10. Morphology evolution of thin Ni film on MgO(100) substrate

    International Nuclear Information System (INIS)

    Lin, C.; Xu, Y.H.; Naramoto, H.; Wei, P.; Kitazawa, S.; Narumi, K.

    2002-01-01

    Thin Ni films with various thicknesses were deposited onto the MgO(100) single crystal substrate at 400 deg. C. The morphology measured by atomic force microscope shows an apparent correlation with the thickness. The initial 10 A film is composed of small round Ni islands. In the 25 A film, pinholes with narrow size distribution occur, which show local periodic distribution in some regions when the thickness of the film reaches 75 A. The driving force for such a structure is attributed to the elastic strain energy. When the film is about 100 A thick, the pinholes begin to disappear, due to filling by the late-coming atoms and covering of upper islands. (author)

  11. Deuterium absorption in Mg{sub 70}Al{sub 30} thin films with bilayer catalysts: A comparative neutron reflectometry study

    Energy Technology Data Exchange (ETDEWEB)

    Poirier, Eric [National Research Council Canada/Canadian Neutron Beam Centre, Bldg. 459, Chalk River Laboratories, Chalk River, ON, K0J 1J0 (Canada); Harrower, Chris T.; Kalisvaart, Peter [Chemical and Materials Engineering, University of Alberta and National Research Council Canada/National Institute for Nanotechnology, Edmonton, AB, T6G 2M9 (Canada); Bird, Adam [National Research Council Canada/Canadian Neutron Beam Centre, Bldg. 459, Chalk River Laboratories, Chalk River, ON, K0J 1J0 (Canada); Teichert, Anke [Helmholtz Zentrum Berlin, Hahn-Meitner-Platz 1, 14109 Berlin (Germany); Instituut voor Kern-en Stralingsfysica and INPAC, K.U. Leuven, Celestijnenlaan 200D, B-3001 Leuven (Belgium); Laboratorium voor Vaste-Stoffysica en Magnetisme and INPAC, K.U. Leuven, Celestijnenlaan 200D, B-3001 Leuven (Belgium); Wallacher, Dirk; Grimm, Nico; Steitz, Roland [Helmholtz Zentrum Berlin, Hahn-Meitner-Platz 1, 14109 Berlin (Germany); Mitlin, David [Chemical and Materials Engineering, University of Alberta and National Research Council Canada/National Institute for Nanotechnology, Edmonton, AB, T6G 2M9 (Canada); Fritzsche, Helmut, E-mail: Helmut.Fritzsche@nrc-cnrc.gc.ca [National Research Council Canada/Canadian Neutron Beam Centre, Bldg. 459, Chalk River Laboratories, Chalk River, ON, K0J 1J0 (Canada)

    2011-05-05

    Highlights: > Mg{sub 70}Al{sub 30} thin films studied for hydrogen absorption using in situ neutron reflectometry. > Films with Ta/Pd, Ti/Pd and Ni/Pd bilayer catalysts systematically compared. > Measurements reveals deuterium spillover from the catalysts to the MgAl phase. > The use of Ti-Pd bilayer offers best results in terms of amount absorbed and kinetics. > Key results cross-checked with X-ray reflectometry. - Abstract: We present a neutron reflectometry study of deuterium absorption in thin films of Al-containing Mg alloys capped with a Ta/Pd, Ni/Pd and Ti/Pd-catalyst bilayer. The measurements were performed at room temperature over the 0-1 bar pressure range under quasi-equilibrium conditions. The modeling of the measurements provided a nanoscale representation of the deuterium profile in the layers at different stages of the absorption process. The absorption mechanism observed was found to involve spillover of atomic deuterium from the catalyst layer to the Mg alloy phase, followed by the deuteration of the Mg alloy. Complete deuteration of the Mg alloy occurs in a pressure range between 100 and 500 mbar, dependent on the type of bilayer catalyst. The use of a Ti/Pd bilayer catalyst yielded the best results in terms of both storage density and kinetic properties.

  12. Study of the ternary alloy systems Al-Ni-Fe and Al-Cu-Ru with special regard to quasicrystalline phases

    International Nuclear Information System (INIS)

    Lemmerz, U.

    1996-07-01

    Two ternary alloy-systems, the Al-Ni-Fe system and the Al-Cu-Ru system were studied with special regard to quasicrystalline phases. Isothermal sections were established in both systems in the stoichiometric area of the quasicrystalline phase. In the Al-Ni-Fe system a new stable decagonal phase was found. Its stoichiometric range is very small around Al 71.6 Ni 23.0 Fe 5.4 . The temperature range in which it is stable lies between 847 and 930 C. The decagonal phase undergoes a eutectoid reaction to the three crystalline phases Al 3 Ni 2 , Al 3 Ni and Al 13 Fe 4 at 847 C. It melts peritectically at 930 C forming Al 13 Fe 4 , Al 3 Ni 2 and a liquid. The investigations in the Al-Cu-Ru system concentrated on the phase equilibria between the icosahedral phase and its neighbouring phases in a temperature range between 600 and 1000 C. The icosahedral phase was observed in the whole temperature range. The investigated stoichiometric area extends down to Al contents of 45%, which allows the fields of existence to be determined for the ternary phases α-AlCuRu, the icosahedral phase and Al 7 Cu 2 Ru. Binary phases were determined down to the upper (high Al content) border of AlRu. No hitherto unknown phase was observed in the investigated area. Rietveld analyses were carried out on α-AlCuRu and Al 7 Cu 2 Ru showing some discrepancies from the α-AlMnSi structure taken as a base for α-AlCuRu and confirming the Al 7 Cu 2 Fe structure for Al 7 Cu 2 Ru. (orig.)

  13. Synthesis and characterization of Cu–Al–Ni shape memory alloy multilayer thin films

    Energy Technology Data Exchange (ETDEWEB)

    Gómez-Cortés, J.F. [Dpt. Física Materia Condensada, Facultad de Ciencia y Tecnología, Universidad del País Vasco, Apdo. 644, 48080 Bilbao (Spain); San Juan, J., E-mail: jose.sanjuan@ehu.es [Dpt. Física Materia Condensada, Facultad de Ciencia y Tecnología, Universidad del País Vasco, Apdo. 644, 48080 Bilbao (Spain); López, G.A.; Nó, M.L. [Dpt. Física Aplicada II, Facultad de Ciencia y Tecnología, Universidad del País Vasco, Apdo. 644, 48080 Bilbao (Spain)

    2013-10-01

    Among active materials, shape memory alloys are well recognized for their work output density. Because of that, these alloys have attracted much attention to be used in micro/nano electromechanical systems. In the present work, the electron beam evaporation technique has been used to growth, by a multilayer method, two shape memory alloy thin films with different Cu–Al–Ni composition. Multilayers have been further thermally treated to produce the alloys by solid solution diffusion. The produced multilayers have been characterized and the presence of the martensite phase in the obtained thin films was studied. Furthermore, the influence of two different coatings onto the Si substrates, namely Si/SiO{sub 2} and Si/Si{sub 3}N{sub 4}, was investigated. Mechanically stable, not detaching from the substrates, Cu–Al–Ni shape memory alloy thin films, about 1 micrometre thick, showing a martensitic transformation have been produced. - Highlights: ► Multilayer thin films of Cu–Al–Ni shape memory alloys produced by e-beam evaporation. ► SiN{sub X} 200 nm thick coating is good for high quality Cu–Al–Ni shape memory thin films. ► Thermal treatment renders Cu–Al–Ni multilayer in homogeneous martensite thin film.

  14. Improvement in ductility of high strength polycrystalline Ni-rich Ni{sub 3}Al alloy produced by EB-PVD

    Energy Technology Data Exchange (ETDEWEB)

    Sun, J.Y.; Pei, Y.L.; Li, S.S.; Zhang, H.; Gong, S.K., E-mail: gongsk@buaa.edu.cn

    2014-11-25

    Highlights: • High strength and high ductility of polycrystalline Ni-rich Ni{sub 3}Al alloy sheets were produced. • The elongation could be enhanced from ∼0.5% to ∼14.6% by microstructural control. • The fracture strength (∼820 MPa) was enhanced by the precipitation strengthening. • This work provides a general processing for repairing the worn single crystal blades. - Abstract: A 300 μm Ni-rich Ni{sub 3}Al sheet was produced by electron beam physical vapor deposition (EB-PVD) and followed by different heat treatments to obtain fine γ′/γ two-phase structures with large elongation. Tensile testing was performed at room-temperature, and the corresponding mechanisms were investigated in detail. Results indicated that the as-deposited Ni{sub 3}Al alloy exhibited non-equilibrium directional columnar crystal, and transited to equiaxed crystal with uniformly distributed tough γ phase after heat treatment. Meanwhile, the fracture mechanism transited from brittleness to a mixture of ductility and brittleness modes. With an appropriate heat treatment, high strength (ultimate tensile strength obtained 828 MPa) and high ductility (elongation obtained 14.6%) Ni{sub 3}Al alloy has been achieved, which was due to the mesh network microstructure. A series of transmission electron microscope (TEM) characterizations confirmed that the increasing flow stress of Ni{sub 3}Al alloy was attributed to the cubical secondary γ′ phase precipitates (25–50 nm) within the γ phase. This work provides a potential strategy for repairing the worn tip of single crystal engine blades using Ni-rich Ni{sub 3}Al alloy by EB-PVD.

  15. NiCoCrAl/YSZ laminate composites fabricated by EB-PVD

    International Nuclear Information System (INIS)

    Shi Guodong; Wang Zhi; Liang Jun; Wu Zhanjun

    2011-01-01

    Highlights: → The metal-ceramic laminate composites were fabricated by EB-PVD. → Both metal and ceramic layers consisted of straight columns with banded structures. → Columnar grain size was limited by the periodic layer interfaces in the laminates. → Effect of columns on fracture property was decreased by limiting layer thickness. → Laminates showed greater specific strength than monolithic metal foil. - Abstract: Two NiCoCrAl/YSZ laminate composites (A and B) with different metal-layer thickness (∼35 μm and 14 μm, respectively) were fabricated by electron beam physical vapor deposition (EB-PVD). Their microstructure was examined and their mechanical properties were compared with the 289 μm thick NiCoCrAl monolithic foil produced by EB-PVD. Both the YSZ and NiCoCrAl layers of the laminate composites had columnar grain structure. But the periodic layer interfaces limited the columnar grain size. Some pores between the columns were also observed. It was found that the strength of the laminate A was equal approximately to that of the NiCoCrAl monolithic foil, and that laminate B had the greater strength. Moreover, the density of the foils decreased with the increasing thickness ratio of YSZ/NiCoCrAl layers and the increasing the layer number. Thus, comparing with the NiCoCrAl monolithic foil, the NiCoCrAl/YSZ laminate composites not only had the equal or greater strength, but also had the much greater specific strength.

  16. Synthesis and Performance Evaluation of Pulse Electrodeposited Ni-AlN Nanocomposite Coatings

    Directory of Open Access Journals (Sweden)

    Kamran Ali

    2018-01-01

    Full Text Available This research work presents the microscopic analysis of pulse electrodeposited Ni-AlN nanocomposite coatings using SEM and AFM techniques and their performance evaluation (mechanical and electrochemical by employing nanoindentation and electrochemical methods. The Ni-AlN nanocomposite coatings were developed by pulse electrodeposition. The nickel matrix was reinforced with various amounts of AlN nanoparticles (3, 6, and 9 g/L to develop Ni-AlN nanocomposite coatings. The effect of reinforcement concentration on structure, surface morphology, and mechanical and anticorrosion properties was studied. SEM and AFM analyses indicate that Ni-AlN nanocomposite coatings have dense, homogenous, and well-defined pyramid structure containing uniformly distributed AlN particles. A decent improvement in the corrosion protection performance is also observed by the addition of AlN particles to the nickel matrix. Corrosion current was reduced from 2.15 to 1.29 μA cm−2 by increasing the AlN particles concentration from 3 to 9 g/L. It has been observed that the properties of Ni-AlN nanocomposite coating are sensitive to the concentration of AlN nanoparticles used as reinforcement.

  17. Strength and ductility of Ni3Al alloyed with boron and substitutional elements

    International Nuclear Information System (INIS)

    Ishikawa, K.; Aoki, K.; Masumoto, T.

    1995-01-01

    The effect of simultaneous alloying of boron (B) and the substitutional elements M on mechanical properties of Ni 3 Al was investigated by the tensile test at room temperature. The yield strength of Ni 3 Al+B increases by alloying with M except for Fe and Ga. In particular, it increases by alloying with Hf, Nb, W, Ta, Pd and Si. The fracture strength of Ni 3 Al+B increases by alloying with Pd, Ga, Si and Hf, but decreases with the other elements. Elongation of Ni 3 Al+B increases by alloying with Ga, Fe and Pd, but decreases with other elements. Hf and Pd is the effective element for the increase of the yield strength and the fracture strength of Ni 3 Al+B, respectively. Alloying with Hf leads to the increases of the yield strength and the fracture strength of Ni 3 Al+B, but to the lowering of elongation. On the other hand, alloying with Pd improves all mechanical properties, i.e. the yield strength, the fracture strength and elongation. On the contrary, alloying with Ti, V and Co leads to the lowering of mechanical properties of Ni 3 Al+B. The reason why ductility of Ni 3 Al+B is reduced by alloying with some elements M is discussed

  18. Electrolytically exfoliated graphene-loaded flame-made Ni-doped SnO2 composite film for acetone sensing.

    Science.gov (United States)

    Singkammo, Suparat; Wisitsoraat, Anurat; Sriprachuabwong, Chakrit; Tuantranont, Adisorn; Phanichphant, Sukon; Liewhiran, Chaikarn

    2015-02-11

    In this work, flame-spray-made SnO2 nanoparticles are systematically studied by doping with 0.1-2 wt % nickel (Ni) and loading with 0.1-5 wt % electrolytically exfoliated graphene for acetone-sensing applications. The sensing films (∼12-18 μm in thickness) were prepared by a spin-coating technique on Au/Al2O3 substrates and evaluated for acetone-sensing performances at operating temperatures ranging from 150 to 350 °C in dry air. Characterizations by X-ray diffraction, transmission/scanning electron microscopy, Brunauer-Emmett-Teller analysis, X-ray photoelectron spectroscopy and Raman spectroscopy demonstrated that Ni-doped SnO2 nanostructures had a spheriodal morphology with a polycrystalline tetragonal SnO2 phase, and Ni was confirmed to form a solid solution with SnO2 lattice while graphene in the sensing film after annealing and testing still retained its high-quality nonoxidized form. Gas-sensing results showed that SnO2 sensing film with 0.1 wt % Ni-doping concentration exhibited an optimal response of 54.2 and a short response time of ∼13 s toward 200 ppm acetone at an optimal operating temperature of 350 °C. The additional loading of graphene at 5 wt % into 0.1 wt % Ni-doped SnO2 led to a drastic response enhancement to 169.7 with a very short response time of ∼5.4 s at 200 ppm acetone and 350 °C. The superior gas sensing performances of Ni-doped SnO2 nanoparticles loaded with graphene may be attributed to the large specific surface area of the composite structure, specifically the high interaction rate between acetone vapor and graphene-Ni-doped SnO2 nanoparticles interfaces and high electronic conductivity of graphene. Therefore, the 5 wt % graphene loaded 0.1 wt % Ni-doped SnO2 sensor is a promising candidate for fast, sensitive and selective detection of acetone.

  19. Fabrication, microstructure and stress effects in sputtered TiNi thin films

    International Nuclear Information System (INIS)

    Grummon, D.S.

    2000-01-01

    Sputtered thin films of equiatomic TiNi and TiNiX ternary alloys have excellent mechanical properties and exhibit robust shape-memory and transformational superelasticity. Furthermore, the energetic nature of the sputter deposition process allows the creation of highly refined microstructures that are difficult to achieve by melt-solidification. The present paper will present recent work on the relationship between processing, microstructure and properties of binary TiNi thin films, focusing primarily on residual stresses, kinetics of stress-relaxation and crystallization, and fine grain sizes achievable using hot-substrate direct crystallization. (orig.)

  20. Fabrication and characterization of NiO thin films prepared by SILAR method

    International Nuclear Information System (INIS)

    Akaltun, Yunus; Çayır, Tuba

    2015-01-01

    Highlights: • NiO thin films have been deposited on glass substrates using SILAR method for the first time. • The electron effective mass, refractive index were calculated by using the energy bandgap values. • The effect of film thickness on the structural, optical and electrical properties were studied. • The bandgap values of the films decreased from 3.71 to 3.67 eV. - Abstract: NiO thin films were synthesised on glass substrates at room temperature using the Successive Ionic Layer Adsorption and Reaction (SILAR) method. The effect of film thickness on the structural, morphological, optical and electrical properties of NiO thin films was investigated. The X-ray diffraction (XRD) and scanning electron microscopy (SEM) studies showed that all the films exhibit polycrystalline structure are covered well with glass substrates. The crystalline and surface properties of the films improved with increasing film thickness. The energy band gap values were decreased from 3.71 to 3.67 eV depending on the film thickness. The refractive index (n), optical static (ε o ) and high frequency dielectric constant (ε ∞ ) values were calculated by using the energy band gap values as a function of the film thickness. The resistivity of the films varied between 4.1 and 802.1 Ω cm with increasing film thickness at room temperature

  1. Fabrication and characterization of NiO thin films prepared by SILAR method

    Energy Technology Data Exchange (ETDEWEB)

    Akaltun, Yunus [Department of Electrical and Electronic Engineering, Erzincan University, 24100 Erzincan (Turkey); Çayır, Tuba [Department of Biomedical Engineering, Erzincan University, 24100 Erzincan (Turkey)

    2015-03-15

    Highlights: • NiO thin films have been deposited on glass substrates using SILAR method for the first time. • The electron effective mass, refractive index were calculated by using the energy bandgap values. • The effect of film thickness on the structural, optical and electrical properties were studied. • The bandgap values of the films decreased from 3.71 to 3.67 eV. - Abstract: NiO thin films were synthesised on glass substrates at room temperature using the Successive Ionic Layer Adsorption and Reaction (SILAR) method. The effect of film thickness on the structural, morphological, optical and electrical properties of NiO thin films was investigated. The X-ray diffraction (XRD) and scanning electron microscopy (SEM) studies showed that all the films exhibit polycrystalline structure are covered well with glass substrates. The crystalline and surface properties of the films improved with increasing film thickness. The energy band gap values were decreased from 3.71 to 3.67 eV depending on the film thickness. The refractive index (n), optical static (ε{sub o}) and high frequency dielectric constant (ε{sub ∞}) values were calculated by using the energy band gap values as a function of the film thickness. The resistivity of the films varied between 4.1 and 802.1 Ω cm with increasing film thickness at room temperature.

  2. Nanoparticle size and morphology control using ultrafast laser induced forward transfer of Ni thin films

    Energy Technology Data Exchange (ETDEWEB)

    Murphy, Ryan D. [Applied Physics Program, University of Michigan, Ann Arbor, Michigan 48109 (United States); Abere, Michael J.; Schrider, Keegan J.; Yalisove, Steven M. [Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States); Torralva, Ben [Department of Atmospheric, Oceanic and Space Sciences, University of Michigan, Ann Arbor, Michigan 48109 (United States)

    2013-08-26

    We have developed a nanoparticle (NP) printing technique using Ni thin film lift-off from glass substrates after ultrafast irradiation in air. Unique interactions of ultrafast laser pulses with thin films allow for control over NP faceting and size distributions. Control is achieved by changing the laser fluence, film thickness, and film-substrate distance. We demonstrate 20 nm Ni film removal from substrates and rapid NP printing, with size distributions centered at a 6 nm diameter. When the Ni film thickness is lowered to 10 nm, NPs are printed with distributions peaked at a 2 nm diameter.

  3. High-quality AlN films grown on chemical vapor-deposited graphene films

    Directory of Open Access Journals (Sweden)

    Chen Bin-Hao

    2016-01-01

    Full Text Available We report the growth of high-quality AlN films on graphene. The graphene films were synthesized by CVD and then transferred onto silicon substrates. Epitaxial aluminum nitride films were deposited by DC magnetron sputtering on both graphene as an intermediate layer and silicon as a substrate. The structural characteristics of the AlN films and graphene were investigated. Highly c-axis-oriented AlN crystal structures are investigated based on the XRDpatterns observations.

  4. Ductility and fracture behavior of polycrystalline Ni/sub 3/Al alloys

    International Nuclear Information System (INIS)

    Liu, C.T.

    1987-01-01

    This paper provides a comprehensive review of the recent work on tensile ductility and fracture behavior of Ni/sub 3/Al alloys tested at ambient and elevated temperatures. Polycrystalline Ni/sub 3/Al is intrinsically brittle along grain boundaries, and the brittleness has been attributed to the large difference in valency, electronegativity, and atom size between nickel and aluminum atoms. Alloying with B, Mn, Fe, and Be significantly increases the ductility and reduces the propensity for intergranular fracture in Ni/sub 3/Al alloys. Boron is found to be most effective in improving room-temperature ductility of Ni/sub 3/Al with <24.5 at.% Al. The tensile ductility of Ni/sub 3/Al alloys depends strongly on test environments at elevated temperatures, with much lower ductilities observed in air than in vacuum. The loss in ductility is accompanied by a change in fracture mode from transgranular to intergranular. This embrittlement is due to a dynamic effect involving simultaneously high localized stress, elevated temperature, and gaseous oxygen. The embrittlement can be alleviated by control of grain shape or alloying with chromium additions. All the results are discussed in terms of localized stress concentration and grain-boundary cohesive strength

  5. Room-temperature ferromagnetism in Dy films doped with Ni

    International Nuclear Information System (INIS)

    Edelman, I.; Ovchinnikov, S.; Markov, V.; Kosyrev, N.; Seredkin, V.; Khudjakov, A.; Bondarenko, G.; Kesler, V.

    2008-01-01

    Temperature, magnetic field and spectral dependences of magneto-optical effects (MOEs) in bi-layer films Dy (1-x) Ni x -Ni and Dy (1-x) (NiFe) x -NiFe were investigated, x changes from 0 to 0.06. Peculiar behavior of the MOEs was revealed at temperatures essentially exceeding the Curie temperature of bulk Dy which is explained by the magnetic ordering of the Dy layer containing Ni under the action of two factors: Ni impurities distributed homogeneously over the whole Dy layer and atomic contact of this layer with continues Ni layer. The mechanism of the magnetic ordering is suggested to be associated with the change of the density of states of the alloy Dy (1-x) Ni x owing to hybridization with narrow peaks near the Fermi level character for Ni

  6. Microstructure evolution during annealing of TiAl/NiCoCrAl multilayer composite prepared by EB-PVD

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Rubing, E-mail: zrb86411680@126.com [Department of Mechanics, School of Civil Engineering, Beijing Jiaotong University, Beijing 100044 (China); Zhang, Deming [Beijing General Research Institute of Mining and Metallurgy, Beijing 100044 (China); Chen, Guiqing [Center for Composite Materials, Harbin Institute of Technology, Harbin 150001 (China); Wang, Yuesheng [Department of Mechanics, School of Civil Engineering, Beijing Jiaotong University, Beijing 100044 (China)

    2014-07-01

    TiAl/NiCoCrAl laminate composite sheet with a thickness of 0.4–0.6 mm as well as a dimension of 150 mm × 100 mm was fabricated successfully by using electron beam physical vapor deposition (EB-PVD) method. The annealing treatment was processed at 1123 and 1323 K for 3 h in a high vacuum atmosphere, respectively. The phase composition and microstructure of TiAl/NiCoCrAl microlaminated sheet have been analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Based on the sheet characterization and results of the microstructure evolution during annealing treatment process, the diffusion mechanism of interfacial reaction in TiAl/NiCoCrAl microlaminate was investigated and discussed.

  7. Shape memory characteristics of sputter-deposited Ti-Ni thin films

    International Nuclear Information System (INIS)

    Miyazaki, Shuichi; Ishida, Akira.

    1994-01-01

    Ti-Ni shape memory alloy thin films were deposited using an RF magnetron sputtering apparatus. The as-sputtered films were heat-treated in order to crystallize and memorize. After the heat treatment, the shape memory characteristics have been investigated using DSC and thermomechanical tests. Upon cooling the thin films, the solution-treated films showed a single peak in the DSC curve indicating a single stage transformation occurring from B2 to the martensitic phase, while the age-treated films showed double peaks indicating a two-stage transformation, i.e., from B2 to the R-phase, then to the martensitic phase. A perfect shape memory effect was achieved in these sputter-deposited Ti-Ni thin films in association both with the R-phase and martensitic transformations. Transformation temperatures increased linearly with increasing applied stress. The transformation strain also increased with increasing stress. The shape memory characteristics were strongly affected by heat-treatment conditions. (author)

  8. Hydrogen storage properties of LaMgNi{sub 3.6}M{sub 0.4} (M = Ni, Co, Mn, Cu, Al) alloys

    Energy Technology Data Exchange (ETDEWEB)

    Yang, Tai [Department of Functional Material Research, Central Iron and Steel Research Institute, Beijing 100081 (China); Key Laboratory of Integrated Exploitation of Baiyun Obo Multi-Metal Resources, Inner Mongolia University of Science and Technology, Baotou 014010 (China); Zhai, Tingting; Yuan, Zeming; Bu, Wengang [Department of Functional Material Research, Central Iron and Steel Research Institute, Beijing 100081 (China); Xu, Sheng [Key Laboratory of Integrated Exploitation of Baiyun Obo Multi-Metal Resources, Inner Mongolia University of Science and Technology, Baotou 014010 (China); Zhang, Yanghuan, E-mail: zhangyh59@sina.com [Department of Functional Material Research, Central Iron and Steel Research Institute, Beijing 100081 (China); Key Laboratory of Integrated Exploitation of Baiyun Obo Multi-Metal Resources, Inner Mongolia University of Science and Technology, Baotou 014010 (China)

    2014-12-25

    Highlights: • La–Mg–Ni system AB{sub 2}-type alloys were prepared by induction melting. • Structures and lattice parameters were analysed by XRD. • Hydrogen absorption/desorption performances were studied. • Mechanisms of hydrogen absorption capacity fading were investigated. - Abstract: LaMgNi{sub 3.6}M{sub 0.4} (M = Ni, Co, Mn, Cu, Al) alloys were prepared through induction melting process. The phase compositions and crystal structures were characterised via X-ray diffraction (XRD). The hydrogen storage properties, including activation performance, hydrogen absorption capacity, cycle stability, alloy particle pulverisation and plateau pressure, were systemically investigated. Results show that Ni, Co, Mn and Cu substitution alloys exhibit multiphase structures comprising the main phase LaMgNi{sub 4} and the secondary phase LaNi{sub 5}. However, the secondary phase of the Al substitution alloy changes into LaAlNi{sub 4}. The lattice parameters and cell volumes of the LaMgNi{sub 4} phase follow the order Ni < Co < Al < Cu < Mn. Activation is simplified through partial substitution of Ni with Al, Cu and Co. The hydrogen absorption capacities of all of the alloys are approximately 1.7 wt.% at the first activation process; however, they rapidly decrease with increasing cycle number. In addition, the stabilities of hydriding and dehydriding cycles decrease in the order Al > Co > Ni > Cu > Mn. Hydriding processes result in numerous cracks and amorphisation of the LaMgNi{sub 4} phase in the alloys. The p–c isotherms were determined by a Sieverts-type apparatus. Two plateaus were observed for the Ni, Co and Al substitution alloys, whereas only one plateau was found for Mn and Cu. This result was caused by the amorphisation of the LaMgNi{sub 4} phase during the hydriding cycles. Reversible absorption and desorption of hydrogen are difficult to achieve. Substitutions of Ni with Co, Mn, Cu and Al significantly influence the reduction of hysteresis between

  9. Bonding characteristics in NiAl intermetallics with O impurity: a first-principles computational tensile test

    International Nuclear Information System (INIS)

    Hu Xuelan; Zhang Ying; Lu Guanghong; Wang Tianmin

    2009-01-01

    We have performed a first-principles computational tensile test on NiAl intermetallics with O impurity along the [001] crystalline direction on the (110) plane to investigate the tensile strength and the bonding characteristics of the NiAl-O system. We show that the ideal tensile strength is largely reduced due to the presence of O impurity in comparison with pure NiAl. The investigations of the atomic configuration and bond-length evolution show that O prefers to bond with Al, forming an O-Al cluster finally with the break of O-Ni bonds. The O-Ni bonds are demonstrated to be weaker than the O-Al bonds, and the reduced tensile strength originates from such weaker O-Ni bonds. A void-like structure forms after the break of the O-Ni and some Ni-Al bonds. Such a void-like structure can act as the initial nucleation or the propagation path of the crack, and thus produce large effects on the mechanical properties of NiAl.

  10. Study of the central collisions in the reactions Ni + Al and Ni + Ni at 28 A.MeV; Etude des collisions centrales dans les reactions Ni + Al et Ni + Ni a 28 A.MeV

    Energy Technology Data Exchange (ETDEWEB)

    Lebreton, L.

    1995-12-01

    The work is in characterisation of mechanisms in the energy range of onset of multifragmentation (excitation energy of composed nucleus around 4 - 5 AMeV). This work focused on an experiment performed at the SARA facility, in Grenoble, using the AMPHORA multi detection array. I have been particularly interested in central collisions in the Ni + Al and Ni + Ni systems. The possibility to detect complete events for Ni + Al, and quasi-complete events for the Ni + Ni case, is the reason of this choice. Furthermore Ni + Ni presents the interest of a symmetrical system, for which the excitation energy per nucleon is maximum. The study of these reactions has been focused on the quasi-complete events (events for which at least 80 % of the total charge has been detected). Heavy ions produced in peripheral collisions are very likely emitted along the beam line or stopped in the plastic detectors, energy thresholds are too high for the quasi-target products detection, consequently by requiring complete or quasi-complete measurement of the total charge, we are able to detect mostly central events. The knowledge of informations like charge, energy or detection angles allows to isolate the source(s) and to reconstruct the size and the excitation energy of the source(s). Comparisons with simulations like sequential emission (GEMINI code), very deep inelastic collision or instantaneous emission (Berliner code) allows to characterise the first stage of the collision (binary collisions or central collisions) and the type of deexcitation of the source(s). Some calculations was also performed with the statistical model code MODGAN. Indeed azimuthal correlations seem to be a good tool in getting more information about involved reaction mechanisms. Comparisons with MODGAN provide information about angular momentum of the source and time delay between emissions of the two particles (separation between sequential or instantaneous process). (author). 69 refs.

  11. Growth of CdTe: Al films; Crecimiento de peliculas de CdTe: Al

    Energy Technology Data Exchange (ETDEWEB)

    Gonzalez A, M.; Zapata T, M. [CICATA-IPN, 89600 Altamira, Tamaulipas (Mexico); Melendez L, M. [CINVESTAV-IPN, A.P. 14-740, 07000 Mexico D.F. (Mexico); Pena, J.L. [CINVESTAV-IPN, A.P. 73 Cordemex, 97310 Merida, Yucatan (Mexico)

    2006-07-01

    CdTe: AI films were grown by the close space vapor transport technique combined with free evaporation (CSVT-FE). The Aluminum (Al) evaporation was made by two kinds of sources: one made of graphite and the other of tantalum. The films were deposited on glass substrates. The Al source temperature was varied maintaining the CdTe source temperature fixed as well as the substrate temperature. The films were characterized by x-ray energy dispersive analysis (EDAX), x-ray diffraction and optical transmission. The results showed for the films grown with the graphite source for Al evaporation, the Al did not incorporate in the CdTe matrix, at least to the level of EDAX sensitivity; they maintained the same crystal structure and band gap. For the samples grown with the tantalum source, we were able to incorporate the Al. The x-ray diffraction patterns show that the films have a crystal structure that depends on Al concentration. They were cubic up to 2.16 at. % Al concentration; for 19.65 at. % we found a mixed phase; for Al concentration higher than 21 at. % the films were amorphous. For samples with cubic structure it was found that the lattice parameter decreases and the band gap increases with Al concentration. (Author)

  12. Electronic structures and relevant physical properties of Ni2MnGa alloy films

    International Nuclear Information System (INIS)

    Kim, K. W.; Kim, J. B.; Huang, M. D.; Lee, N. N.; Lee, Y. P.; Kudryavtsev, Y. V.; Rhee, J. Y.

    2004-01-01

    The electronic structures and physical properties of the ordered and disordered Ni 2 MnGa alloy films were investigated in this study. Ordered and disordered Ni 2 MnGa alloy films were prepared by flash evaporation onto substrates maintained at 720 K and 150 K, respectively. The results show that the ordered films behave in nearly the same way as the bulk Ni 2 MnGa ferromagnetic shape-memory alloy, including the martensitic transformation at 200 K. It was also revealed that the film deposition onto substrates cooled by liquid nitrogen leads to the formation of a substantially-disordered or an amorphous phase which is not ferromagnetically ordered at room temperature. An annealing of such an amorphous film restores its crystallinity and also recovers the ferromagnetic order. It was also clarified how the structural disordering in the films influences the physical properties, including the loss of ferromagnetism in the disordered films, by performing electronic-structure calculations and a photoemission study.

  13. Superstructure formation in PrNi_2Al_3 and ErPd_2Al_3

    International Nuclear Information System (INIS)

    Eustermann, Fabian; Hoffmann, Rolf-Dieter; Janka, Oliver; Oldenburg Univ.

    2017-01-01

    The intermetallic phase ErPd_2Al_3 was obtained by arc-melting of the elements and subsequent annealing for crystal growth. The sample was studied by X-ray diffraction on powders and single crystals. The structure of ErPd_2Al_3 was refined from X-ray diffraction data and revealed a superstructure of PrNi_2Al_3 - a CaCu_5 derivative (P6/m, a=1414.3(1), c=418.87(3) pm wR=0.0820, 1060 F"2 values, 48 variables). The same superstructure was subsequently found for PrNi_2Al_3 (P6/m, a=1407.87(4), c=406.19(2) pm, wR=0.0499, 904 F"2 values, 47 variables). In the crystal structure, the aluminium and transition metal atoms form a polyanionic network according to [T_2Al_3]"δ"-, while rare earth atoms fill cavities within the networks. They are coordinated by six transition metal and twelve aluminum atoms. In contrast to the PrNi_2Al_3 type structure reported so far, two crystallographic independent rare-earth sites are found of which one (1b) is shifted by 1/2 z, causing a distortion in the structure along with a recoloring of the T and Al atoms in the network.

  14. The evaluation of Young's modulus and residual stress of Cu films by NiFe/Cu bilayer film microbridge tests

    International Nuclear Information System (INIS)

    Zhou Zhimin; Zhou Yong; Cao Ying; Ding Wen; Mao Haiping

    2008-01-01

    This paper proposes a method to estimate the thickness limit for single-layer microbridge tests and also the thickness limit of one film on another film with known thickness for bilayer microbridge tests. To evaluate the mechanical properties of the Cu film, which could not be measured by single-layer microbridge tests, the NiFe single-layer film and NiFe/Cu bilayer film on silicon substrate are fabricated onto the microbridge by the MEMS technique. A load–deflection experiment is conducted upon the ceramic shaft adhered to the microbridge center by means of the XP nanoindenter system. From single-layer microbridge theory, Young's modulus and the residual stress of the NiFe film are deduced to be 192.74 ± 8.10 GPa and 287.75 ± 16.18 MPa, respectively. The data are introduced into bilayer microbridge theory and Young's modulus and the residual stress of the copper film are calculated to be 118.71 ± 6.54 GPa and 41.34 ± 4.42 MPa, respectively. The experimental results correspond well with those of nanoindentation

  15. P-channel transparent thin-film transistor using physical-vapor-deposited NiO layer

    Science.gov (United States)

    Lin, Chiung-Wei; Chung, Wei-Chieh; Zhang, Zhao-De; Hsu, Ming-Chih

    2018-01-01

    The effect of oxygen (O) content on the electrical properties of physical-vapor-deposited nickel oxide (PVD-NiO) was studied. When the NiO target was sputtered, introducing O2 can lead to the formation of Ni3+ ions in the deposited film. These Ni3+ ions can act as acceptors. However, there were too many Ni3+ ions that were obtained following the introduction of O atoms. It resulted in intensive p-type conduction and made the O2-introduced PVD-NiO behave as a conductor. Thus, it was possible to reduce the O content of PVD-NiO to obtain a p-type semiconductor. In this study, a transparent PVD-NiO film with a carrier concentration of 1.62 × 1017 cm-3 and a resistivity of 3.74 Ω cm was sputter-deposited within pure argon plasma. The thin-film transistor (TFT) employing this proposed PVD-NiO can result in good current switching, and even operated at very low drain-source voltage. The ON/OFF current ratio, field-effect carrier mobility, and threshold voltage of the proposed NiO TFT were 3.61 × 104, 1.09 cm2 V-1 s-1 and -3.31 V, respectively.

  16. Study of Cu-Al-Ni-Ga as high-temperature shape memory alloys

    Science.gov (United States)

    Zhang, Xin; Wang, Qian; Zhao, Xu; Wang, Fang; Liu, Qingsuo

    2018-03-01

    The effect of Ga element on the microstructure, mechanical properties and shape memory effect of Cu-13.0Al-4.0Ni- xGa (wt%) high-temperature shape memory alloy was investigated by optical microscopy, SEM, XRD and compression test. The microstructure observation results showed that the Cu-13.0Al-4.0Ni- xGa ( x = 0.5 and 1.0) alloys displayed dual-phase morphology which consisted of 18R martensite and (Al, Ga)Cu phase, and their grain size was about several hundred microns, smaller than that of Cu-13.0Al-4.0Ni alloy. The compression test results proved that the mechanical properties of Cu-13.0Al-4.0Ni- xGa alloys were improved by addition of Ga element owing to the grain refinement and solid solution strengthening, and the compressive fracture strains were 11.5% for x = 0.5 and 14.9% for x = 1.0, respectively. When the pre-strain was 8%, the shape memory effect of 4.2 and 4.6% were obtained for Cu-13.0Al-4.0Ni-0.5 Ga and Cu-13.0Al-4.0Ni-1.0 Ga alloys after being heated to 400 °C for 1 min.

  17. Prospects for designing structural cast eutectic alloys on Al-Ce-Ni system base

    International Nuclear Information System (INIS)

    Belov, N.A.; Naumova, E.S.

    1996-01-01

    The phase diagram of Al-Ce-Ni system is built for an aluminium corner at component concentration up to 16 mass %Ce and 8 mass%Ni. A ternary eutectic reaction is established at 12%Ce, 5%Ni and 626 deg C. The ternary eutectic alloy is similar in structure to rapidly cooled Al base alloys with transition metals. The possibility to design new cast alloys based on three-phase (Al)+NiAl 3 +CeAl 4 eutectics is under consideration. Al-Zn-Mg-Cu, Al-Sc and Al-Zr base alloys can be used as (Al) constituent of the eutectics. The new alloys may be considered as heat resistant ones due to the fact that no structural changes are observed in castings on heating up to 350 deg C. 18 refs.; 4 figs.; 2 tabs

  18. Disorder trapping in Ni3(Al, Ti) by solidification from the undercooled melt

    International Nuclear Information System (INIS)

    Goetzinger, R.; Kurz, W.

    1997-01-01

    Modelling of rapid solidification predicts disorder trapping in the superlattice structure of Ni 3 Al. However, experimental investigations on this compound suffer from ambiguities concerning the solidification path. There is a phase selection competition between the ordered fcc γ'-phase (Ni 3 Al), the ordered bcc β-phase (NiAl), the disordered fcc γ-phase (Ni), the stable γ'/β eutectic and the metastable γ/β eutectic, and there are subsequent solid state transformations. A replacement of several at.% Al by Ti leads to a stabilization of the γ'-phase and to an avoidance of most of the problems encountered on Ni 3 Al. The experiments on Ni 3 (Al, Ti) presented here clearly show the expected disordered crystallization from the undercooled melt. This was proven by measuring the dendrite growth velocity of electromagnetically levitated droplets and by analysing the data in the framework of dendrite and kinetic growth models. Complementary microstructural investigations were performed on the as-solidified samples. (orig.)

  19. Modification effect of Ni-38 wt.%Si on Al-12 wt.%Si alloy

    International Nuclear Information System (INIS)

    Wu Yuying; Liu Xiangfa; Jiang Binggang; Huang Chuanzhen

    2009-01-01

    Modification effect of Ni-38 wt.%Si on the Al-12 wt.%Si alloy has been studied by differential scanning calorimeter, torsional oscillation viscometer and liquid X-ray diffraction experiments. It is found that there is a modification effect of Ni-38 wt.%Si on Al-12 wt.%Si alloy, i.e. primary Si can precipitate in the microstructure of Al-12 wt.%Si alloy when Ni and Si added in the form of Ni-38 wt.%Si, but not separately. Ni-38 wt.%Si alloy brings 'genetic materials' into the Al-Si melt, which makes the melt to form more ordering structure, promotes the primary Si precipitated. Moreover, the addition of Ni-38 wt.%Si, which decreases the solidification supercooling degree of Al-12 wt.%Si alloy, is identical to the effect of heterogeneous nuclei.

  20. Modification effect of Ni-38 wt.%Si on Al-12 wt.%Si alloy

    Energy Technology Data Exchange (ETDEWEB)

    Wu Yuying [Key Laboratory of Liquid Structure and Heredity of Materials, Ministry of Education, Shandong University, Ji' nan 250061 (China)], E-mail: wyy532001@163.com; Liu Xiangfa [Key Laboratory of Liquid Structure and Heredity of Materials, Ministry of Education, Shandong University, Ji' nan 250061 (China); Shandong Binzhou Bohai Piston Co., Ltd., Binzhou 256602, Shandong (China); Jiang Binggang [Key Laboratory of Liquid Structure and Heredity of Materials, Ministry of Education, Shandong University, Ji' nan 250061 (China); Huang Chuanzhen [School of Mechanical Engineering, Shandong University, Jinan 250061 (China)

    2009-05-27

    Modification effect of Ni-38 wt.%Si on the Al-12 wt.%Si alloy has been studied by differential scanning calorimeter, torsional oscillation viscometer and liquid X-ray diffraction experiments. It is found that there is a modification effect of Ni-38 wt.%Si on Al-12 wt.%Si alloy, i.e. primary Si can precipitate in the microstructure of Al-12 wt.%Si alloy when Ni and Si added in the form of Ni-38 wt.%Si, but not separately. Ni-38 wt.%Si alloy brings 'genetic materials' into the Al-Si melt, which makes the melt to form more ordering structure, promotes the primary Si precipitated. Moreover, the addition of Ni-38 wt.%Si, which decreases the solidification supercooling degree of Al-12 wt.%Si alloy, is identical to the effect of heterogeneous nuclei.

  1. Al{sub 2} O{sub 3}:Cr,Ni: a possible thermoluminescent dosemeter; Al{sub 2} O{sub 3}: Cr, Ni un posible dosimetro termoluminiscente

    Energy Technology Data Exchange (ETDEWEB)

    Mariani R, Francisco; Roman B, Alvaro; Saavedra S, Renato [Pontificia Univ. Catolica de Chile, Santiago (Chile). Facultad de Fisica; Ibarra S, Angel [Centro de Investigaciones Energeticas, Medioambientales y Tecnologicas (CIEMAT), Madrid (Spain). Seccion Materiales para Fusion

    1997-12-31

    Results from a study on the thermoluminescent (Tl) emission from Al{sub 2} O{sub 3}:Cr,Ni are presented. The measurements were obtained for evaluation of the Al{sub 2} O{sub 3}:Cr,Ni dosimetric properties. Different crystal batches were exposed to two kind of ionizing radiation (X-ray and {beta}{sup -}). The Tl spectrum has a main peak with high thermal and optical stability, deviating from linearity for doses lower than 3.6 Gy. Furthermore, this material shows advantages (thermal resistance, reusability, multiple heating cycles) compared to TLD-100. Measured Al{sub 2} O{sub 3}:Cr,Ni properties indicate that it could be used as a dosemeter. (author). 5 refs., 4 figs.

  2. Anomalous Hall effect in polycrystalline Ni films

    KAUST Repository

    Guo, Zaibing

    2012-02-01

    We systematically studied the anomalous Hall effect in a series of polycrystalline Ni films with thickness ranging from 4 to 200 nm. It is found that both the longitudinal and anomalous Hall resistivity increased greatly as film thickness decreased. This enhancement should be related to the surface scattering. In the ultrathin films (46 nm thick), weak localization corrections to anomalous Hall conductivity were studied. The granular model, taking into account the dominated intergranular tunneling, has been employed to explain this phenomenon, which can explain the weak dependence of anomalous Hall resistivity on longitudinal resistivity as well. © 2011 Elsevier Ltd. All rights reserved.

  3. Modification of NiAl intermetallic coatings processed by PTA with chromium carbides

    International Nuclear Information System (INIS)

    Yano, Diogo Henrique Sepel; Brunetti, Cristiano; Pintaude, Giuseppe; Oliveira, Ana Sofia Climaco Monteiro d'

    2010-01-01

    Equipment that operate under high-temperatures can be protected with NiAl intermetallic coatings mainly because of their metallurgical stability. This study as it evaluates the effect of chromium carbide added to Ni-Al intermetallic coatings processed by PTA. Three Ni-Al-Cr23C6 powder mixtures with different carbide fractions (15, 30 and 45 wt%) and another without carbides were deposited by PTA on an AISI 304 stainless steel plate, using two different current intensities (100 and 150A). Coatings were evaluated regarding the presence of welding defects, and resultant microstructures were characterized by X-ray diffraction and scanning electron microscopy. Vickers microhardness and EDS chemical composition were also determined. NiAl and Cr_7C_3 development was confirmed by X-ray diffraction analysis. A combination of NiAl/Cr-Fe-Ni phases was identified. The hardness was strongly related to the formed phases and their amounts. Besides presenting advances toward the development of coatings which can withstand severe operation conditions, the present study shows that PTA hardfacing is able to produce reinforced intermetallic coatings for high-temperature applications. (author)

  4. Al2 O3:Cr,Ni: a possible thermoluminescent dosemeter

    International Nuclear Information System (INIS)

    Mariani R, Francisco; Roman B, Alvaro; Saavedra S, Renato; Ibarra S, Angel

    1996-01-01

    Results from a study on the thermoluminescent (Tl) emission from Al 2 O 3 :Cr,Ni are presented. The measurements were obtained for evaluation of the Al 2 O 3 :Cr,Ni dosimetric properties. Different crystal batches were exposed to two kind of ionizing radiation (X-ray and β - ). The Tl spectrum has a main peak with high thermal and optical stability, deviating from linearity for doses lower than 3.6 Gy. Furthermore, this material shows advantages (thermal resistance, reusability, multiple heating cycles) compared to TLD-100. Measured Al 2 O 3 :Cr,Ni properties indicate that it could be used as a dosemeter. (author)

  5. Processing and microstructure of melt spun NiAl alloys

    Science.gov (United States)

    Locci, I. E.; Noebe, R. D.; Moser, J. A.; Lee, D. S.; Nathal, M.

    1989-01-01

    The influence of various melt spinning parameters and the effect of consolidation on the microstructure of melt spun NiAl and NiAl + W alloys have been examined by optical and electron microscopy techniques. It was found that the addition of 0.5 at. pct W to NiAl results in a fine dispersion of W particles after melt spinning which effectively controls grain growth during annealing treatments or consolidation at temperatures between 1523 and 1723 K. Increased wheel speeds are effective at reducing both the ribbon thickness and grain size, such that proper choice of both composition and casting parameters can produce structures with grain sizes as small as 2 microns. Finally, fabrication of continuous fiber-reinforced composites which used pulverized ribbon as the matrix material was demonstrated.

  6. XPS characterization of surface and interfacial structure of sputtered TiNi films on Si substrate

    International Nuclear Information System (INIS)

    Fu Yongqing; Du Hejun; Zhang, Sam; Huang Weimin

    2005-01-01

    TiNi films were prepared by co-sputtering TiNi and Ti targets. X-ray photoelectron spectroscopy (XPS) was employed to study surface chemistry of the films and interfacial structure of Si/TiNi system. Exposure of the TiNi film to the ambient atmosphere (23 deg. C and 80% relatively humidity) facilitated quick adsorption of oxygen and carbon on the surface. With time, carbon and oxygen content increased drastically at the surface, while oxygen diffused further into the layer. After a year, carbon content at the surface became as high as 65.57% and Ni dropped below the detection limit of XPS. Depth profiling revealed that significant inter-diffusion occurred between TiNi film and Si substrate with a layer of 90-100 nm. The detailed bond changes of different elements with depth were obtained using XPS and the formation of titanium silicides at the interface were identified

  7. Room-temperature ferromagnetism in Dy films doped with Ni

    Energy Technology Data Exchange (ETDEWEB)

    Edelman, I. [Kirensky Institute of Physics, Siberian Division, Russian Academy of Sciences, Akademgorodok, Krasnoyarsk 660036 (Russian Federation)], E-mail: ise@iph.krasn.ru; Ovchinnikov, S. [Kirensky Institute of Physics, Siberian Division, Russian Academy of Sciences, Akademgorodok, Krasnoyarsk 660036 (Russian Federation); Siberian Federal University, Av. Svobodnyi 71, Krasnoyarsk 660074 (Russian Federation); Markov, V.; Kosyrev, N.; Seredkin, V.; Khudjakov, A.; Bondarenko, G. [Kirensky Institute of Physics, Siberian Division, Russian Academy of Sciences, Akademgorodok, Krasnoyarsk 660036 (Russian Federation); Kesler, V. [Institute of Semiconductor Physics, Siberian Division, Russian Academy of Sciences, Av. Akademika Lavrent' eva 13, Novosibirsk 630090 (Russian Federation)

    2008-09-01

    Temperature, magnetic field and spectral dependences of magneto-optical effects (MOEs) in bi-layer films Dy{sub (1-x)}Ni{sub x}-Ni and Dy{sub (1-x)}(NiFe){sub x}-NiFe were investigated, x changes from 0 to 0.06. Peculiar behavior of the MOEs was revealed at temperatures essentially exceeding the Curie temperature of bulk Dy which is explained by the magnetic ordering of the Dy layer containing Ni under the action of two factors: Ni impurities distributed homogeneously over the whole Dy layer and atomic contact of this layer with continues Ni layer. The mechanism of the magnetic ordering is suggested to be associated with the change of the density of states of the alloy Dy{sub (1-x)}Ni{sub x} owing to hybridization with narrow peaks near the Fermi level character for Ni.

  8. Magnetism of coherent Co and Ni thin films on Cu(111) and Au(111) substrates: An ab initio study

    Energy Technology Data Exchange (ETDEWEB)

    Zelený, Martin, E-mail: zeleny@fme.vutbr.cz; Dlouhý, Ivo

    2017-02-15

    We present an ab initio study of structural and magnetic properties of coherent Co and Ni thin films on Cu(111) and Au(111) substrates with thicknesses of up to 6 monolayers. All studied films on Cu(111) substrates prefer structures close their ground state (hcp for Co and fcc for Ni), whereas only the hcp stacking sequence has been found for both films on Au(111) substrates. All studied films exhibit instability of the first monolayer with respect to decomposition into 2-monolayer- or 3-monolayer-high islands, which is in agreement with experimental findings. All studied films are also ferromagnetic, nevertheless the Ni/Cu(111) films reduce their magnetic moments in the layer adjacent to the substrate due to a stronger Cu–Ni interaction at the interface. The magnetic anisotropy of a Co film does not depend on the film thickness: all the studied Co/Au(111) films exhibit a perpendicular magnetic anisotropy, whereas all the Co/Cu(111) films prefer in-plane magnetization. On the other hand, both Ni films change their preference for in-plane orientation of their easy axis to out-of-plane orientation at a critical thickness of 2 monolayers, however, the magnetic anisotropy energies for films thicker than 1 monolayer are smaller than 1 meV/Ni atom. These behaviors of magnetic anisotropy do not depend on the structure of the studied films. - Highlights: • All films exhibit instability of the first monolayer and prefer grow in islands. • The Cu–Ni interaction is responsible for reduced Ni magnetic moments in Ni/Cu(111) films. • The Co/Au(111) and Co/Cu(111) films show different orientations of magnetic anisotropy. • The Ni films exhibit in-plane magnetization only for single monolayer. • Behaviors of magnetic anisotropy do not depend on the structure of the studied films.

  9. Molar Volume Analysis of Molten Ni-Al-Co Alloy by Measuring the Density

    Institute of Scientific and Technical Information of China (English)

    XIAO Feng; FANG Liang; FU Yuechao; YANG Lingchuan

    2004-01-01

    The density of molten Ni-Al-Co alloys was measured in the temperature range of 1714~1873K using a modified pycnometric method, and the molar volume of molten alloys was analyzed. The density of molten Ni-Al-Co alloys was found to decrease with increasing temperature and Co concentration in alloys. The molar volume of molten Ni-Al-Co alloys increases with increasing Co concentration in alloys. The molar volume of molten Ni-Al-Co alloys shows a negative deviation from the linear molar volume.

  10. Magnetoresistances in Ni80Fe20-ITO granular film

    International Nuclear Information System (INIS)

    Gao Chunhong; Chen Ke; Yang Yanxia; Xiong Yuanqiang; Chen Peng

    2012-01-01

    Highlights: ► Magnetoresistance (MR) in Ni 80 Fe 20 -ITO granular film are investigated. ► MR is positive at high temperature, and is negative at low temperature. ► MR results from the competition among three mechanisms. - Abstract: The magnetic properties, electrical properties and magnetoresistance are investigated in Ni 80 Fe 20 -ITO granular film with various volume fractions V NF of Ni 80 Fe 20 . The room temperature magnetization hysteresis of sample with V NF = 25% shows superparamagnetic behavior. Current-voltage curve of sample with V NF = 25% at 175 K shows typical tunneling-type behavior. The magnetoresistances of samples with low V NF are positive at high temperature, and are negative at low temperature. The temperature-dependent magnetoresistances result from the competition among ordinary magnetoresistances, the granular-typed tunneling magnetoresistance and the spin-mixing induced magnetoresistances.

  11. Microstructure and mechanical behavior of a shape memory Ni-Ti bi-layer thin film

    Energy Technology Data Exchange (ETDEWEB)

    Mohri, Maryam [School of Metallurgy and Materials Engineering, College of Engineering, University of Tehran, Tehran (Iran, Islamic Republic of); Karlsruhe Institute of Technology, Institute of Nanotechnology, 76021 Karlsruhe (Germany); Nili-Ahmadabadi, Mahmoud, E-mail: nili@ut.ac.ir [School of Metallurgy and Materials Engineering, College of Engineering, University of Tehran, Tehran (Iran, Islamic Republic of); Center of Excellence for High Performance Materials, University of Tehran, Tehran (Iran, Islamic Republic of); Ivanisenko, Julia [Karlsruhe Institute of Technology, Institute of Nanotechnology, 76021 Karlsruhe (Germany); Schwaiger, Ruth [Karlsruhe Institute of Technology, Institute for Applied Materials, 76021 Karlsruhe (Germany); Hahn, Horst; Chakravadhanula, Venkata Sai Kiran [Karlsruhe Institute of Technology, Institute of Nanotechnology, 76021 Karlsruhe (Germany)

    2015-05-29

    Two different single-layers and a bi-layer Ni-Ti thin films with chemical compositions of Ni{sub 45}Ti{sub 50}Cu{sub 5}, Ni{sub 50.8}Ti{sub 49.2} and Ni{sub 50.8}Ti{sub 49.2}/Ni{sub 45}Ti{sub 50}Cu{sub 5} (numbers indicate at.%) determined by energy dispersive X-ray spectroscopy were deposited on Si (111) substrates using DC magnetron sputtering. The structures, surface morphology and transformation temperatures of annealed thin films at 500 °C for 15 min and 1 h were studied using grazing incidence X-ray diffraction, transmission electron microscopy (TEM), atomic force microscopy and differential scanning calorimetry (DSC), respectively. Nanoindentation was used to characterize the mechanical properties. The DSC and X-ray diffraction results indicated the austenitic structure of the Ni{sub 50.8}Ti{sub 49.2} and martensitic structure of the Ni{sub 45}Ti{sub 50}Cu{sub 5} thin films while the bi-layer was composed of austenitic and martensitic thin films. TEM study revealed that copper encourages crystallization in the bi-layer such that crystal structure containing nano-precipitates in the Ni{sub 45}Ti{sub 50}Cu{sub 5} layer was detected after 15 min annealing while the Ni{sub 50.8}Ti{sub 49.2} layer crystallized after 60 min at 500 °C. Furthermore, after annealing at 500 °C for 15 min, a precipitate free zone and thin layer amorphous were observed closely to the interface in the top layer. The bi-layer was completely crystallized at 500 °C for 1 h and the orientation of the Ni-rich precipitates indicated a stress gradient in the bi-layer. The bi-layer thin film showed different transformation temperatures and mechanical behavior from the single-layers. The developed bi-layer has different phase transformation temperatures, the higher temperatures of shape memory effect and lower temperature of pseudo-elastic behavior compared to the single-layers. Also, the bi-layer thin film exhibited a combined pseudo-elastic behavior and shape memory effect with a reduced

  12. Mechanical Behavior and Fracture Properties of NiAl Intermetallic Alloy with Different Copper Contents

    Directory of Open Access Journals (Sweden)

    Tao-Hsing Chen

    2016-03-01

    Full Text Available The deformation behavior and fracture characteristics of NiAl intermetallic alloy containing 5~7 at% Cu are investigated at room temperature under strain rates ranging from 1 × 10−3 to 5 × 103 s−1. It is shown that the copper contents and strain rate both have a significant effect on the mechanical behavior of the NiAl alloy. Specifically, the flow stress increases with an increasing copper content and strain rate. Moreover, the ductility also improves as the copper content increases. The change in the mechanical response and fracture behavior of the NiAl alloy given a higher copper content is thought to be the result of the precipitation of β-phase (Ni,CuAl and γ'-phase (Ni,Cu3Al in the NiAl matrix.

  13. M(Al,Ni)-TiO2-Based Photoanode for Photoelectrochemical Solar Cells

    Science.gov (United States)

    Navas, Javier; Reyes-Pérez, Fran; Alcántara, Rodrigo; Fernández-Lorenzo, Concha; Bernal, Juan Jesús Gallardo; Martín-Calleja, Joaquín

    2018-05-01

    This study presents the incorporation of Al and Ni cations onto the surface of TiO2 nanoparticles used as photoelectrode in dye sensitized solar cells (DSSCs). The incorporation of these cations was performed using the chemical bath deposition (CBD) technique. This process was applied up to three times to evaluate the semiconductors' properties with respect to the amount of Al and Ni. The M(Al,Ni)-TiO2-based semiconductors were widely characterized using techniques such as X-ray fluorescence, X-ray diffraction, Raman spectroscopy, UV-Vis spectroscopy and X-ray photoelectron spectroscopy. The presence of (hydr)oxide species of Al(III) and Ni(II) was confirmed and anatase was the predominant crystalline phase obtained. Moreover, for both elements, a decrease in the band gap energy was observed, this being more pronounced after the incorporation of Ni. Furthermore, the use of the M(Al,Ni)-TiO2-based semiconductors as photoelectrodes in DSSCs led to an increase in the open-circuit voltage of up to 22% and 10% for the incorporation of Al and Ni, respectively. This increase can be reasonably explained by the negative shift of the flat band potential of the photoelectrodes. EIS measurements were performed to study the electron transport kinetics in the photoelectrode and the internal resistance in the DSSCs to understand the photocurrent density values obtained.

  14. Microstructure and Properties of Ni and Ni/Al2O3 Coatings Electrodeposited at Various Current Densities

    Directory of Open Access Journals (Sweden)

    Góral A.

    2016-03-01

    Full Text Available The study presents investigations of an influence of various direct current densities on microstructure, residual stresses, texture, microhardness and corrosion resistance of the nickel coatings electrodeposited from modified Watt’s baths. The properties of obtained coatings were compared to the nano-crystalline composite Ni/Al2O3 coatings prepared under the same plating conditions. The similarities and differences of the obtained coatings microstructures visible on both their surfaces and cross sections and determined properties were presented. The differences in the growth character of the Ni matrix and in the microstructural properties were observed. All electrodeposited Ni and Ni/Al2O3 coatings were compact and well adhering to the steel substrates. The thickness and the microhardness of the Ni and Ni/Al2O3 deposits increased significantly with the current density in the range 2 - 6 A/dm2. Residual stresses are tensile and they reduced as the current density increased. The composite coatings revealed better protection from the corrosion of steel substrate than pure nickel in solution 1 M NaCl.

  15. X-ray study of rapidly cooled ribbons of Al-Cr-Zr and Al-Ni-Y-Cr-Zr alloys

    International Nuclear Information System (INIS)

    Betsofen, S.Ya.; Osintsev, O.E.; Lutsenko, A.N.; Konkevich, V.Yu.

    2002-01-01

    One investigated into phase composition, lattice spacing and structure of rapidly cooled 25-200 μm gauge strips made of Al-4,1Cr-3,2Zr and Al-1,5Cr-1,5Zr-4Ni-3Y alloys, wt. %, produced by melt spinning to a water-cooled copper disk. In Al-4,1Cr-3,2Zr alloy one detected intermetallic phases: Al 3 Zr and two Al 86 Cr 14 composition icosahedral phases apart from aluminium solid solution with 4.040-4.043 A lattice spacing. In Al-1,5Cr-1,5Zr-4Ni-3Y alloy one identified two Al 86 Cr 14 icosahedral phases and two AlNiY and Al 3 Y yttrium-containing ones, lattice spacing of aluminium solid solution was equal to 4.052-4.053 A [ru

  16. Study of mechanical-magnetic and electromagnetic properties of PZT/Ni film systems by a novel bulge technique

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Q.; Zhou, W.; Ding, J.; Xiao, M. [School of Materials Science and Engineering, Xiangtan University, Hunan 411105 (China); Key Laboratory of Film Materials and Devices of Science and Technology Department of Hunan Province, Xiangtan University, Hunan 411105 (China); Yu, Z.J.; Xu, H. [State Key Lab for Turbulence and Complex Systems, Peking University, Beijing 100871 (China); Mao, W.G., E-mail: ssamao@126.com [School of Materials Science and Engineering, Xiangtan University, Hunan 411105 (China); Key Laboratory of Film Materials and Devices of Science and Technology Department of Hunan Province, Xiangtan University, Hunan 411105 (China); Pei, Y.M.; Li, F.X. [State Key Lab for Turbulence and Complex Systems, Peking University, Beijing 100871 (China); Feng, X. [AML, Department of Engineering Mechanics, Tsinghua University, Beijing 100084 (China); Fang, D.N., E-mail: fangdn@pku.edu.cn [State Key Lab for Turbulence and Complex Systems, Peking University, Beijing 100871 (China); Institute of Advanced Structure Technology, Beijing Institute of Technology, Beijing 100081 (China)

    2017-02-01

    A novel multiple functional bulge apparatus was designed to study the mechanical-electronic-magnetic characteristics of electromagnetic materials. The elastic modulus difference effect of Ni thin film was observed and it was about 22.16% in the demagnetized and magnetization saturated states. The mechanical-magnetic behaviors of Ni and lead-titanate zirconate (PZT)/Ni films were in-situ measured by using the new bulge systems, respectively. The evolutions of three key material properties in hysteresis loop including saturation magnetization, remanent magnetization and coercive field were discussed in detail, respectively. The mechanisms of mechanical-magnetic coupled behaviors of Ni and PZT/Ni films were analyzed with the aid of the competitive relationship of stress and magnetization. Similarly, the electronic-magnetic characteristics of PZT/Ni films were in-situ measured by using this experimental system. The evolution of saturated magnetization, remanent magnetization and coercive field Kerr signals were discussed with the magneto-elastic anisotropy energy point. In this paper, a suitable mechanical-electronic-magnetic bulge measurement system was established, which would provide a good choice for further understanding the multi field coupling characteristics of electromagnetic film materials. - Highlights: • A novel bulge apparatus was designed to study electromagnetic materials. • The mechanical-magnetic features of Ni film were studied by this new apparatus. • The ΔE effect of Ni film was observed and analyzed. • The mechanical electronic-magnetic characteristics of PZT/Ni film were discussed.

  17. Determination of the enthalpy of formation of Ni-Al intermetallic compounds using differential scanning calorimetry technique

    International Nuclear Information System (INIS)

    Kubaski, Evaldo Toniolo; Capocchi, Jose Deodoro Trani; Cintho, Osvaldo Mitsuyuki

    2010-01-01

    The compositions Ni20Al80, Ni25Al75, Ni40Al60, Ni50Al50, Ni60Al40 and Ni75Al25 (at. %) were heated in a calibrated thermal analysis equipment. All runs were conducted at a heating rate of 10 deg C/min under a dynamic argon atmosphere. Each composition was heated until the completion of the corresponding exothermic reaction responsible for intermetallic compound formation, and, also heated to 1480 deg C. The products obtained were characterized using X ray diffraction in order to identify the intermetallic compounds that were synthesized. Moreover, the results were evaluated using variance analysis. As a result, enthalpies of formation of Ni 2 Al 3 and Ni 3 Al compounds were determined by means of this methodology. Experimental values were 167 kJ/mol and 93 kJ/mol for Ni 2 Al 3 and Ni 3 Al, respectively. The former is 18% lower than the value found on literature, while the latter is 6% greater. (author)

  18. Formation and structure of nanocrystalline Al-Mn-Ni-Cu alloys

    International Nuclear Information System (INIS)

    Latuch, J.; Krasnowski, M.; Ciesielska, B.

    2002-01-01

    This paper reports the results of the short investigation on the effect of Cu additions upon the nanocrystallization behaviour of an Al-Mn-Ni alloy. 2 at.% Cu added to the base alloy of Al 85 Mn 10 Ni 5 alloy by substitution for Mn(mischmetal). The control of cooling rate did not cause the formation of nanocrystals of fcc-Al phase. The nanocrystalline structure fcc-Al + amorphous phase in quarternary alloy was obtained by isothermal annealing and continuous heating method, but the last technique is more effective. The volume fraction, lattice parameter, and size of Al-phase were calculated. (author)

  19. Nanocrystalline Pd:NiFe2O4 thin films: A selective ethanol gas sensor

    International Nuclear Information System (INIS)

    Rao, Pratibha; Godbole, R.V.; Bhagwat, Sunita

    2016-01-01

    In this work, Pd:NiFe 2 O 4 thin films were investigated for the detection of reducing gases. These films were fabricated using spray pyrolysis technique and characterized using X-ray diffraction (XRD) to confirm the crystal structure. The surface morphology was studied using scanning electron microscopy (SEM). Magnetization measurements were carried out using SQUID VSM, which shows ferrimagnetic behavior of the samples. These thin film sensors were tested against methanol, ethanol, hydrogen sulfide and liquid petroleum gas, where they were found to be more selective to ethanol. The fabricated thin film sensors exhibited linear response signal for all the gases with concentrations up to 5 w/o Pd. Reduction in optimum operating temperature and enhancement in response was also observed. Pd:NiFe 2 O 4 thin films exhibited faster response and recovery characteristic. These sensors have potential for industrial applications because of their long-term stability, low power requirement and low production cost. - Highlights: • Ethanol gas sensors based on Pd:NiFe 2 O 4 nanoparticle thin film were fabricated. • Pd incorporation in NiFe 2 O 4 matrix inhibits grain growth. • The sensors were more selective to ethanol gas. • Sensors exhibited fast response and recovery when doped with palladium. • Pd:NiFe 2 O 4 thin film sensor displays excellent long–term stability.

  20. Magnetron sputtered Cu{sub 3}N/NiTiCu shape memory thin film heterostructures for MEMS applications

    Energy Technology Data Exchange (ETDEWEB)

    Kaur, Navjot; Choudhary, Nitin [Indian Institute of Technology Roorkee, Roorkee, Functional Nanomaterials Research Lab, Department of Physics and Centre of Nanotechnology (India); Goyal, Rajendra N. [Indian Institute of Technology, Roorkee, Department of Chemistry (India); Viladkar, S. [Indian Institute of Technology Roorkee, Roorkee, Functional Nanomaterials Research Lab, Department of Physics and Centre of Nanotechnology (India); Matai, I.; Gopinath, P. [Indian Institute of Technology, Roorkee, Centre for Nanotechnology (India); Chockalingam, S. [Indian Institute of Technology, Guwahati, Department of Biotechnology (India); Kaur, Davinder, E-mail: dkaurfph@iitr.ernet.in [Indian Institute of Technology Roorkee, Roorkee, Functional Nanomaterials Research Lab, Department of Physics and Centre of Nanotechnology (India)

    2013-03-15

    In the present study, for the first time, Cu{sub 3}N/NiTiCu/Si heterostructures were successfully grown using magnetron sputtering technique. Nanocrystalline copper nitride (Cu{sub 3}N with thickness {approx}200 nm) thin films and copper nanodots were subsequently deposited on the surface of 2-{mu}m-thick NiTiCu shape memory thin films in order to improve the surface corrosion and nickel release properties of NiTiCu thin films. Interestingly, the phase transformation from martensite phase to austenite phase has been observed in Cu{sub 3}N/NiTiCu heterostructures with corresponding change in texture and surface morphology of top Cu{sub 3}N films. Field emission scanning electron microscopy and atomic force microscope images of the heterostructures reveals the formation of 20-nm-sized copper nanodots on NiTiCu surface at higher deposition temperature (450 Degree-Sign C) of Cu{sub 3}N. Cu{sub 3}N passivated NiTiCu films possess low corrosion current density with higher corrosion potential and, therefore, better corrosion resistance as compared to pure NiTiCu films. The concentration of Ni released from the Cu{sub 3}N/NiTiCu samples was observed to be much less than that of pure NiTiCu film. It can be reduced to the factor of about one-ninth after the surface passivation resulting in smooth, homogeneous and highly corrosion resistant surface. The antibacterial and cytotoxicity of pure and Cu{sub 3}N coated NiTiCu thin films were investigated through green fluorescent protein expressing E. coli bacteria and human embryonic kidney cells. The results show the strong antibacterial property and non cytotoxicity of Cu{sub 3}N/NiTiCu heterostructure. This work is of immense technological importance due to variety of BioMEMS applications.

  1. Synthesis Of NiCrAlC alloys by mechanical alloying; Sintese de ligas NiCrAlC por moagem de alta energia

    Energy Technology Data Exchange (ETDEWEB)

    Silva, A.K.; Pereira, J.I.; Vurobi Junior, S.; Cintho, O.M., E-mail: alissonkws@gmail.co [Universidade Estadual de Ponta Grossa (UEPG), PR (Brazil)

    2010-07-01

    The purpose of the present paper is the synthesis of nickel alloys (NiCrAlC), which has been proposed like a economic alternative to the Stellite family Co alloys using mechanical alloying, followed by sintering heat treatment of milled material. The NiCrAlC alloys consist of a chromium carbides dispersion in a Ni{sub 3}Al intermetallic matrix, that is easily synthesized by mechanical alloying. The use of mechanical alloying enables higher carbides sizes and distribution control in the matrix during sintering. We are also investigated the compaction of the processed materials by compressibility curves. The milling products were characterized by X-ray diffraction, and the end product was featured by conventional metallography and scanning electronic microscopy (SEM), that enabled the identification of desired phases, beyond microhardness test, which has been shown comparable to alloys manufactured by fusion after heat treating. (author)

  2. Effect of Ni Doping on Gas Sensing Performance of ZnO Thick Film Resistor

    Directory of Open Access Journals (Sweden)

    M. K. DEORE

    2010-11-01

    Full Text Available This work investigates the use of ZnO-NiO as a H2S metal oxide thick film gas sensor. To find the optimum ratio of NiO to ZnO, two compositions were prepared using different molecular percentages and prepared as a thick film paste. These pastes were then screen-printed onto glass substrates with suitable binder. The final composition of each film was determined using SEM analysis. The films were used to detect CO, CL2, ethanol, Amonia and H2S. For each composition tested, the highest responses where displayed for H2S gas. The Thick film having composition of equal molar ZnO and NiO shows the highest response at operating temp. 350 0C for 100 ppm level. The gas response, selectivity, response and recovery time of the sensor were measured and presented. The role played by NiO species is to improve the gas sensing performance is discussed.

  3. Magnetic properties and microstructure investigation of electrodeposited FeNi/ITO films with different thickness

    International Nuclear Information System (INIS)

    Cao, Derang; Wang, Zhenkun; Feng, Erxi; Wei, Jinwu; Wang, Jianbo; Liu, Qingfang

    2013-01-01

    Highlights: •FeNi alloy thin films with different thickness deposited on Indium Tin Oxides (ITOs) conductive glass substrates by electrodeposition method. •A columnar crystalline microstructure and domain structure were obtained in FeNi thin films. •Particular FMR spectra of FeNi alloy with different thickness were studied. -- Abstract: FeNi alloy thin films with different thickness deposited on Indium Tin Oxides (ITOs) conductive glass substrates from the electrolytes by electrodeposition method have been studied by magnetic force microscopy (MFM), scanning electron microscopy (SEM) and ferromagnetic resonance (FMR) technique. For these films possessing an in-plane isotropy, the remanence decreases with the increasing of film thickness and the critical thickness that a stripe domain structure emerges is about 116 nm. Characteristic differences of the FMR spectra of different thickness are also observed. The results show that the resonance field at high measured angle increases firstly then decreases with increasing thickness, which may be related to the striped domain structure

  4. Optical metrology of Ni and NiSi thin films used in the self-aligned silicidation process

    International Nuclear Information System (INIS)

    Kamineni, V. K.; Bersch, E. J.; Diebold, A. C.; Raymond, M.; Doris, B. B.

    2010-01-01

    The thickness-dependent optical properties of nickel metal and nickel monosilicide (NiSi) thin films, used for self-aligned silicidation process, were characterized using spectroscopic ellipsometry. The thickness-dependent complex dielectric function of nickel metal films is shown to be correlated with the change in Drude free electron relaxation time. The change in relaxation time can be traced to the change in grain boundary (GB) reflection coefficient and grain size. A resistivity based model was used as the complementary method to the thickness-dependent optical model to trace the change in GB reflection coefficient and grain size. After silicidation, the complex dielectric function of NiSi films exhibit non-Drude behavior due to superimposition of interband absorptions arising at lower frequencies. The Optical models of the complete film stack were refined using x-ray photoelectron spectroscopy, Rutherford backscattered spectroscopy, and x-ray reflectivity (XRR).

  5. Ni{sub 3}Al technology transfer

    Energy Technology Data Exchange (ETDEWEB)

    Sikka, V.K.; Santella, M.L.; Alexander, D.J. [Oak Ridge National Laboratory, TN (United States)] [and others

    1995-05-01

    Ductile Ni{sub 3}Al and Ni{sub 3}Al-based alloys have been identified for a range of applications. These applications require the use of material in a variety of product forms such as sheet, plate, bar, tubing, piping, and castings. Although significant progress has been made in the melting, casting, and near-net-shape forming of nickel aluminides, some issues still remain. These include the need for (1)high-strength castable composition for turbochargers, furnace furniture, and hot-die applications; (2) castability (fluidity, hot-shortness, porosity, etc.); (3) weld reparability of castings; and (4) hot fabricability of cast ingots. All of the issues listed above can be {open_quotes}show stoppers{close_quotes} for the commercial application of nickel aluminides. This report describes work completed to address some of these issues during the fourth quarter of FY 1994.

  6. Optimized structure stability and electrochemical performance of LiNi0.8Co0.15Al0.05O2 by sputtering nanoscale ZnO film

    Science.gov (United States)

    Lai, Yan-Qing; Xu, Ming; Zhang, Zhi-An; Gao, Chun-Hui; Wang, Peng; Yu, Zi-Yang

    2016-03-01

    LiNi0.8Co0.15Al0.05O2 (NCA) is one of the most promising cathode material for lithium-ion batteries (LIBs) in electric vehicles, which is successfully adopted in Tesla. However, the dissolution of the cation into the electrolyte is still a one of the major challenges (fading capacity and poor cyclability, etc.) presented in pristine NCA. Herein, a homogeneous nanoscale ZnO film is directly sputtered on the surface of NCA electrode via the magnetron sputtering (MS). This ZnO film is evidenced by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The results clearly demonstrate that ZnO film is fully and uniformly covered on the NCA electrodes. After 90 cycles at 1.0C, the optimized MS-2min coated NCA electrode delivers much higher discharge capacity with 169 mAh g-1 than that of the pristine NCA electrode with 127 mAh g-1. In addition, the discharge capacity also reaches 166 mAh g-1 at 3.0C, as compared to that of 125 mAh g-1 for the pristine electrode. The improved electrochemical performance can be ascribed to the superiority of the MS ZnO film that reduce charge transfer resistance and protect the NCA electrode from cation dissolution.

  7. Formation of Ni(Al, Mo) solid solutions by mechanical alloying and their ordering on heating

    International Nuclear Information System (INIS)

    Portnoj, V.K.; Tomilin, I.A.; Blinov, A.M.; Kulik, T.

    2002-01-01

    The Ni(Al, Mo) solid solutions with different crystalline lattice periods (0.3592 and 0.3570 nm correspondingly) are formed in the course of the Ni 70 Al 25 Mo 5 and Ni 75 Al 20 Mo 5 powder mixtures mechanical alloying (MA) (through the mechanical activation in a vibrating mill). After MA the Mo atoms in the Ni 75 Al 20 Mo 5 mixture completely replace the aluminium positions with formation of the Ni 75 (AlMo) 25 (the L1 2 -type) ternary ordered phase, whereby such a distribution remains after heating up to 700 deg C. The Ni(Al, Mo) metastable solution is formed by MA in the Ni 75 Al 20 Mo 5 mixture, which decays with the release of molybdenum and the remained aluminide undergoes ordering by the L1 2 -type [ru

  8. Microstructure and Mechanical Properties of Zn-Ni-Al2O3 Composite Coatings

    Directory of Open Access Journals (Sweden)

    Yang Bai

    2018-05-01

    Full Text Available Zn-Ni-Al2O3 composite coatings with different Ni contents were fabricated by low-pressure cold spray (LPCS technology. The effects of the Ni content on the microstructural and mechanical properties of the coatings were investigated. According to X-ray diffraction patterns, the composite coatings were primarily composed of metallic-phase Zn and Ni and ceramic-phase Al2O3. The energy-dispersive spectroscopy results show that the Al2O3 content of the composite coatings gradually decreased with increasing of Ni content. The cross-sectional morphology revealed thick, dense coatings with a wave-like stacking structure. The process of depositing Zn and Ni particles and Al2O3 particles by the LPCS method was examined, and the deposition mechanism was demonstrated to be mechanical interlocking. The bond strength, micro hardness and friction coefficient of the coatings did not obviously change when the Ni content varied. The presence of Al2O3 and Ni increased the wear resistance of the composite coatings, which was higher than that of pure Zn coatings, and the wear mechanism was abrasive and adhesive wear.

  9. Synthesis and characterization of NiPcTSTNa(L) thin films

    Indian Academy of Sciences (India)

    Optical absorption studies of NiPcTSTNa(L) films were performed in the ... the HOMO–LUMO gap of NiPc as 2·41 eV and suggested that the orbitals next to the ..... magnitude of the electrical conductivities and feasibility of preparing these ...

  10. Effect of copper concentration on the physical properties of copper doped NiO thin films deposited by spray pyrolysis

    Energy Technology Data Exchange (ETDEWEB)

    Mani Menaka, S., E-mail: manimenaka.phy@gmail.com [PG and Research Department of Physics, Government Arts College, Coimbatore, 641018, Tamilnadu (India); Umadevi, G. [PG and Research Department of Physics, Government Arts College, Coimbatore, 641018, Tamilnadu (India); Manickam, M. [SRMV College of Arts and Science, Coimbatore, 641020, Tamilnadu (India)

    2017-04-15

    The spray pyrolysis (SP) technique is an important and powerful method for the preparation of nickel oxide (NiO) and copper-doped nickel oxide thin films. The best films were obtained when the substrate temperature, T{sub s} = 450 °C on glass substrates. Copper (Cu) concentrations in the films were varied from 0 to 8%. The effect of Cu concentration on the structural, morphological, spectral, optical, and electrical properties of the thin films were studied by X-ray diffraction (XRD), Scanning electron microscopy (SEM), Fourier transformed infrared spectroscopy (FTIR), UV–vis–NIR spectrophotometer, Hot probe and Hall system. The X-ray diffraction result shows the polycrystalline cubic structure of sprayed films with (200) preferred orientation. The variations of the structural parameters such as lattice parameters and grain sizes were investigated. The SEM image displays the surface morphology of the NiO and Cu:NiO thin films. The FTIR of the as-deposited films were associated with chemical identification. The optical transmittance and absorbance spectra of the films were measured by UV–vis–NIR spectrophotometer. The absorption coefficient and band gaps of the films were calculated using the optical method. All the NiO and Cu:NiO films were p-type. The resistivity of the above films decreases with the increase in copper concentration and so the conductivity of the films depend on the precursor concentration. - Highlights: • Pure and Cu:NiO films were deposited by Spray pyrolysis technique. • The XRD result shows the polycrystalline nature of pure and Cu:NiO films. • The formation of pure and Cu:NiO were confirmed by FTIR analysis. • Band gap values of pure and Cu:NiO decreases. • All the pure and Cu:NiO films were p-type.

  11. Effect of copper concentration on the physical properties of copper doped NiO thin films deposited by spray pyrolysis

    International Nuclear Information System (INIS)

    Mani Menaka, S.; Umadevi, G.; Manickam, M.

    2017-01-01

    The spray pyrolysis (SP) technique is an important and powerful method for the preparation of nickel oxide (NiO) and copper-doped nickel oxide thin films. The best films were obtained when the substrate temperature, T_s = 450 °C on glass substrates. Copper (Cu) concentrations in the films were varied from 0 to 8%. The effect of Cu concentration on the structural, morphological, spectral, optical, and electrical properties of the thin films were studied by X-ray diffraction (XRD), Scanning electron microscopy (SEM), Fourier transformed infrared spectroscopy (FTIR), UV–vis–NIR spectrophotometer, Hot probe and Hall system. The X-ray diffraction result shows the polycrystalline cubic structure of sprayed films with (200) preferred orientation. The variations of the structural parameters such as lattice parameters and grain sizes were investigated. The SEM image displays the surface morphology of the NiO and Cu:NiO thin films. The FTIR of the as-deposited films were associated with chemical identification. The optical transmittance and absorbance spectra of the films were measured by UV–vis–NIR spectrophotometer. The absorption coefficient and band gaps of the films were calculated using the optical method. All the NiO and Cu:NiO films were p-type. The resistivity of the above films decreases with the increase in copper concentration and so the conductivity of the films depend on the precursor concentration. - Highlights: • Pure and Cu:NiO films were deposited by Spray pyrolysis technique. • The XRD result shows the polycrystalline nature of pure and Cu:NiO films. • The formation of pure and Cu:NiO were confirmed by FTIR analysis. • Band gap values of pure and Cu:NiO decreases. • All the pure and Cu:NiO films were p-type.

  12. In-situ studies of the TGO growth stresses and the martensitic transformation in the B2 phase in commercial Pt-modified NiAl and NiCoCrAlY bond coat alloys

    Energy Technology Data Exchange (ETDEWEB)

    Hovis, D.; Hu, L.; Reddy, A.; Heuer, A.H. [Dept. of Materials Science and Engineering, Case Western Reserve Univ., Cleveland, OH (United States); Paulikas, A.P.; Veal, B.W. [Materials Science Div., Argonne National Lab., Argonne, IL (United States)

    2007-12-15

    Oxide growth stresses were measured in situ at 1100 C on commercial Pt-modified NiAl and NiCoCrAlY bond coat alloys using synchrotron X-rays. Measurements were taken on samples that had no preoxidation, as well as on samples that had experienced 24 one-hour thermal exposures at 1150 C, a condition known to induce rumpling in the Pt-modified NiAl alloy, but not in the NiCoCrAlY alloy. The NiCoCrAlY alloy showed continuous stress relaxation under all conditions, whereas the Pt-modified NiAl alloys would typically stabilize at a fixed (often non-zero) stress suggesting a higher creep strength in the 'Thermally Grown Oxide' on the latter alloy, though the precise behavior was dependent on initial surface preparation. The formation of martensite in the Pt-modified NiAl alloys was also observed upon cooling and occurred at temperatures below 200 C for all of the samples observed. Based on existing models, this M{sub s} temperature is too low to account for the rumpling observed in these alloys. (orig.)

  13. Phase equilibria and stability of the B2 phase in the Ni-Mn-Al and Co-Mn-Al systems

    International Nuclear Information System (INIS)

    Kainuma, R.; Ise, M.; Ishikawa, K.; Ohnuma, I.; Ishida, K.

    1998-01-01

    The phase equilibria and ordering reactions in the composition region up to 50 at.% Al have been investigated in the Ni-Mn-Al and Co-Mn-Al systems at temperatures in the interval 850-1200 C mainly by the diffusion couple method. The compositions of the γ (A1: fcc-Ni, -Co, γ-Mn), γ' (L1 2 : Ni 3 Al), β (B2: NiAl, CoAl, NiMn), β-Mn (A13: β-Mn type), δ-Mn (A2: bcc-Mn) and ε (A3: hcp-(Mn, Al)) phases in equilibrium and the critical boundaries of the A2/B2 continuous ordering transition in the bcc phase region have been determined. It is shown that in the Mn-rich portion of the ternary systems both continuous and discontinuous A2 to B2 ordering transitions exist. The A2+B2 two-phase region in the isothermal sections has a lenticular shape and exists over a wide temperature range. The phase equilibria between the γ, γ', β, β-Mn, δ-Mn and ε phases are presented and the stability of the ordered bcc aluminides is discussed. (orig.)

  14. Ion-beam mixing and thermal annealing of Al--Nb and Al--Ta thin films

    International Nuclear Information System (INIS)

    Rai, A.K.; Bhattacharya, R.S.; Mendiratta, M.G.; Subramanian, P.R.; Dimiduk, D.M.

    1988-01-01

    Ion-beam mixing and thermal annealing of thin, alternating layers of Al and Nb, as well as Al and Ta, were investigated by selected area diffraction and Rutherford backscattering. The individual layer thicknesses were adjusted to obtain the overall compositions as Al 3 Nb and Al 3 Ta. The films were ion mixed with 1 MeV Au + ions at a dose of 1 x 10 16 ions cm/sup -2/ . Uniform mixing and amorphization were achieved for both Al--Nb and Al--Ta systems. Equilibrium crystalline Al 3 Nb and Al 3 Ta phases were formed after annealing of ion mixed amorphous films at 400 0 C for 6 h. Unmixed films, however, remained unreacted at 400 0 C for 1 h. Partial reaction was observed in the unmixed film of Al--Nb at 400 0 C for 6 h. After annealing at 500 0 C for 1 h, a complete reaction and formation of Al 3 Nb and Al 3 Ta phases in the respective films were observed. The influence of thermodynamics on the phase formation by ion mixing and thermal annealing is discussed

  15. Ni adsorption and Ni-Al LDH precipitation in a sandy aquifer: An experimental and mechanistic modeling study

    NARCIS (Netherlands)

    Regelink, I.C.; Temminghoff, E.J.M.

    2011-01-01

    Mining activities and industries have created nickel (Ni) contaminations in many parts of the world. The objective of this study is to increase our understanding of Ni adsorption and Nickel-Aluminium Layered Double Hydroxide (Ni-Al LDH) precipitation to reduce Ni mobility in a sandy soil aquifer. At

  16. A Comparative Study of Carbon Nanotubes Synthesized from Co/Zn/Al and Fe/Ni/Al Catalyst

    Directory of Open Access Journals (Sweden)

    Ezekiel Dixon Dikio

    2011-01-01

    Full Text Available The catalyst systems Fe/Ni/Al and Co/Zn/Al were synthesized and used in the synthesis of carbon nanotubes. The carbon nanotubes produced were characterized by Field Emission Scanning Electron Microscope (FE-SEM, Energy Dispersive x-ray Spectroscopy (EDS, Raman spectroscopy, Thermogravimetric Analysis (TGA and Transmission Electron Microscope (TEM. A comparison of the morphological profile of the carbon nanotubes produced from these catalysts indicates the catalyst system Fe/Ni/Al to have produced higher quality carbon nanotubes than the catalyst system Co/Zn/Al.

  17. Effect of chemical treatment on surface characteristics of sputter deposited Ti-rich NiTi shape memory alloy thin-films

    International Nuclear Information System (INIS)

    Sharma, S.K.; Mohan, S.

    2014-01-01

    Graphical abstract: FTIR spectra recorded for sputter deposited (a) untreated and (b) chemically treated NiTi SMA thin-films. - Highlights: • The effect of chemical treatment on surface properties of NiTi films demonstrated. • Chemically treated films offer strong ability to form protective TiO 2 layer. • TiO 2 layer formation offer great application prospects in biomedical fields. - Abstract: NiTi thin-films were deposited by DC magnetron sputtering from single alloy target (Ni/Ti:45/55 at.%). The rate of deposition and thickness of sputter deposited films were maintained to ∼35 nm min −1 and 4 μm respectively. A set of sputter deposited NiTi films were selected for specific chemical treatment with the solution comprising of de-ionized water, HF and HNO 3 respectively. The influence of chemical treatment on surface characteristics of NiTi films before and after chemical treatment was investigated for their structure, micro-structure and composition using different analytical techniques. Prior to chemical treatment, the composition of NiTi films using energy dispersive X-ray dispersive spectroscopy (EDS), were found to be 51.8 atomic percent of Ti and 48.2 atomic percent of Ni. The structure and morphology of these films were investigated by X-ray diffraction (XRD) and scanning electron microscopy (SEM). XRD investigations, demonstrated the presence of dominant Austenite (1 1 0) phase along with Martensite phase, for untreated NiTi films whereas some additional diffraction peaks viz. (1 0 0), (1 0 1), and (2 0 0) corresponding to Rutile and Anatase phase of Titanium dioxide (TiO 2 ) along with parent Austenite (1 1 0) phase were observed for chemically treated NiTi films. FTIR studies, it can be concluded that chemically treated films have higher tendency to form metal oxide/hydroxide than the untreated NiTi films. XPS investigations, demonstrated the presence of Ni-free surface and formation of a protective metal oxide (TiO 2 ) layer on the surface of

  18. Bulk and surface properties of liquid Al-Cr and Cr-Ni alloys

    International Nuclear Information System (INIS)

    Novakovic, R

    2011-01-01

    The energetics of mixing and structural arrangement in liquid Al-Cr and Cr-Ni alloys has been analysed through the study of surface properties (surface tension and surface segregation), dynamic properties (chemical diffusion) and microscopic functions (concentration fluctuations in the long-wavelength limit and chemical short-range order parameter) in the framework of statistical mechanical theory in conjunction with quasi-lattice theory. The Al-Cr phase diagram exhibits the existence of different intermetallic compounds in the solid state, while that of Cr-Ni is a simple eutectic-type phase diagram at high temperatures and includes the low-temperature peritectoid reaction in the range near a CrNi 2 composition. Accordingly, the mixing behaviour in Al-Cr and Cr-Ni alloy melts was studied using the complex formation model in the weak interaction approximation and by postulating Al 8 Cr 5 and CrNi 2 chemical complexes, respectively, as energetically favoured.

  19. Bulk and surface properties of liquid Al-Cr and Cr-Ni alloys.

    Science.gov (United States)

    Novakovic, R

    2011-06-15

    The energetics of mixing and structural arrangement in liquid Al-Cr and Cr-Ni alloys has been analysed through the study of surface properties (surface tension and surface segregation), dynamic properties (chemical diffusion) and microscopic functions (concentration fluctuations in the long-wavelength limit and chemical short-range order parameter) in the framework of statistical mechanical theory in conjunction with quasi-lattice theory. The Al-Cr phase diagram exhibits the existence of different intermetallic compounds in the solid state, while that of Cr-Ni is a simple eutectic-type phase diagram at high temperatures and includes the low-temperature peritectoid reaction in the range near a CrNi(2) composition. Accordingly, the mixing behaviour in Al-Cr and Cr-Ni alloy melts was studied using the complex formation model in the weak interaction approximation and by postulating Al(8)Cr(5) and CrNi(2) chemical complexes, respectively, as energetically favoured.

  20. In situ Oxidation of Ultrathin Silver Films on Ni(111)

    International Nuclear Information System (INIS)

    Meyer, A.; Flege, I.; Senanayake, S.; Kaemena, B.; Rettew, R.; Alamgir, F.; Falta, J.

    2011-01-01

    Oxidation of silver films of one- and two-monolayer thicknesses on the Ni(111) surface was investigated by low-energy electron microscopy at temperatures of 500 and 600 K. Additionally, intensity-voltage curves were measured in situ during oxidation to reveal the local film structure on a nanometer scale. At both temperatures, we find that exposure to molecular oxygen leads to the destabilization of the Ag film with subsequent relocation of the silver atoms to small few-layer-thick silver patches and concurrent evolution of NiO(111) regions. Subsequent exposure of the oxidized surface to ethylene initiates the transformation of bilayer islands back into monolayer islands, demonstrating at least partial reversibility of the silver relocation process at 600 K.

  1. X-ray determination of static displacements of atoms in alloyed Ni3Al

    International Nuclear Information System (INIS)

    Morinaga, M.; Sone, K.; Kamimura, T.; Ohtaka, K.; Yukawa, N.

    1988-01-01

    Single crystals of Ni 3 (Al, M) were grown by the Bridgman method, where M is Ti, V, Cr, Mn, Fe, Nb, Mo and Ta. The composition was controlled to be about Ni 75 Al 20 M 5 so that the alloying element, M, substitutes mainly for Al. With these crystals conventional X-ray structural analysis was performed. The measured static displacements of atoms from the average lattice points depended largely on the alloying elements and varied in the range 0.00-0.13 A for Ni atoms and 0.09-0.18 A for Al atoms. It was found that these atomic displacements correlated well with the atomic radius of the alloying element, M. For example, when the atomic radius of M is larger than that of Al, the static displacements are large for the atoms in the Al sublattice but small for the atoms in the Ni sublattice. By contrast, when the atomic radius of M is smaller than that of Al, the displacements are more enhanced in the Ni sublattice than in the Al sublattice. Thus, there is an interesting correlation between the atomic displacements in both the Al and Ni sublattices in the presence of alloying elements. This seems to be one of the characteristics of alloyed compounds with several sublattices. (orig.)

  2. Crystallization behavior of Zr62Al8Ni13Cu17 Metallic Glass

    Directory of Open Access Journals (Sweden)

    Jo Mi Sun

    2017-06-01

    Full Text Available The crystallization behavior has been studied in Zr62Al8Ni13Cu17 metallic glass alloy. The Zr62Al8Ni13Cu17 metallic glass crystallized through two steps. The fcc Zr2Ni phase transformed from the amorphous matrix during first crystallization and then the Zr2Ni and residual amorphous matrix transformed into a mixture of tetragonal Zr2Cu and hexagonal Zr6Al2Ni phases. Johnson-Mehl-Avrami analysis of isothermal transformation data suggested that the formation of crystalline phase is primary crystallization by diffusion-controlled growth.

  3. Al/Ni metal intermetallic composite produced by accumulative roll bonding and reaction annealing

    International Nuclear Information System (INIS)

    Mozaffari, A.; Hosseini, M.; Manesh, H. Danesh

    2011-01-01

    Highlights: → Al/Ni metallic composites produced by accumulative roll bonding were heat treated at different temperatures and periods, to investigate the effect of reaction annealing on the structure and mechanical properties. → Based on the annealing conditions, various intermetallic phases were formed. The structure and composition of the composites were detected by SEM and XRD techniques. → The strength of the initial metallic composite can be improved due to the formation of the hard intermetallic phases, by the heat treatment process. - Abstract: In this research, Al/Ni multilayers composites were produced by accumulative roll bonding and then annealed at different temperatures and durations. The structure and mechanical properties of the fabricated metal intermetallic composites (MICs) were investigated. Scanning electron microscopy and X-ray diffraction analyses were used to evaluate the structure and composition of the composite. The Al 3 Ni intermetallic phase is formed in the Al/Ni interface of the samples annealed at 300 and 400 deg. C. When the temperature increased to 500 deg. C, the Al 3 Ni 2 phase was formed in the composite structure and grew, while the Al 3 Ni and Al phases were simultaneously dissociated. At these conditions, the strength of MIC reached the highest content and was enhanced by increasing time. At 600 deg. C, the AlNi phase was formed and the mechanical properties of MIC were intensively degraded due to the formation of structural porosities.

  4. Corrosion testing of NiCrAl(Y) coating alloys in high-temperature and supercritical water

    International Nuclear Information System (INIS)

    Biljan, S.; Huang, X.; Qian, Y.; Guzonas, D.

    2011-01-01

    With the development of Generation IV (Gen IV) nuclear power reactors, materials capable of operating in high-temperature and supercritical water environment are essential. This study focuses on the corrosion behavior of five alloys with compositions of Ni20Cr, Ni5Al, Ni50Cr, Ni20Cr5Al and Ni20Cr10AlY above and below the critical point of water. Corrosion tests were conducted at three different pressures, while the temperature was maintained at 460 o C, in order to examine the effects of water density on the corrosion. From the preliminary test results, it was found that the binary alloys Ni20Cr and Ni50Cr showed weight loss above the critical point (23.7 MPa and 460 o C). The higher Cr content alloy Ni50Cr suffered more weight loss than Ni-20Cr under the same conditions. Accelerated weight gain was observed above the critical point for the binary alloy Ni5Al. The combination of Cr, Al and Y in Ni20Cr10AlY provides stable scale formation under all testing conditions employed in this study. (author)

  5. Preparation and characterization of Eosin B- and Erythrosin J-sensitized nanostructured NiO thin film photocathodes

    Energy Technology Data Exchange (ETDEWEB)

    Vera, F. [Instituto de Quimica, Universidad Catolica de Valparaiso, Valparaiso (Chile); Schrebler, R. [Instituto de Quimica, Universidad Catolica de Valparaiso, Valparaiso (Chile); Munoz, E. [Instituto de Quimica, Universidad Catolica de Valparaiso, Valparaiso (Chile); Suarez, C. [Instituto de Quimica, Universidad Catolica de Valparaiso, Valparaiso (Chile); Cury, P. [Instituto de Quimica, Universidad Catolica de Valparaiso, Valparaiso (Chile); Gomez, H. [Instituto de Quimica, Universidad Catolica de Valparaiso, Valparaiso (Chile); Cordova, R. [Instituto de Quimica, Universidad Catolica de Valparaiso, Valparaiso (Chile); Marotti, R.E. [Instituto de Fisica, Facultad de Ingenieria, Universidad de la Republica, Herrera y Reissig 565, C.C. 30, 11000 Montevideo (Uruguay); Dalchiele, E.A. [Instituto de Fisica, Facultad de Ingenieria, Universidad de la Republica, Herrera y Reissig 565, C.C. 30, 11000 Montevideo (Uruguay)]. E-mail: dalchiel@fing.edu.uy

    2005-11-01

    Nickel oxide (NiO) thin films were prepared onto ITO/glass substrates by spin-coating, dipping and electrochemically. Studies of the morphological and structural properties of the films were done by atomic force microscopy (AFM). Photoelectrochemical and optical experiments were carried out in order to characterize the semiconductor properties of the nanostructured NiO thin films. The experiments were also done for Eosin B- and Erythrosin J-sensitized nanostructured NiO films, with the aim to visualize their potential application as photocatodes in tandem dye-sensitized solar cells (TDSSC). The NiO grown by dipping was the one presenting the best morphological properties. The photoelectrochemical results for all the bare NiO, NiO-Eosin B and NiO-Erythrosin J/electrolyte (I{sub 2}/I{sup -}) systems showed a p-type behavior. An enhancement in the photocurrent has been observed for the systems sensitized with the dyes. For the NiO/Erythrosin J system the enhancement of the current under illumination in comparison to the dark current was about 200%.

  6. Preparation and characterization of Eosin B- and Erythrosin J-sensitized nanostructured NiO thin film photocathodes

    International Nuclear Information System (INIS)

    Vera, F.; Schrebler, R.; Munoz, E.; Suarez, C.; Cury, P.; Gomez, H.; Cordova, R.; Marotti, R.E.; Dalchiele, E.A.

    2005-01-01

    Nickel oxide (NiO) thin films were prepared onto ITO/glass substrates by spin-coating, dipping and electrochemically. Studies of the morphological and structural properties of the films were done by atomic force microscopy (AFM). Photoelectrochemical and optical experiments were carried out in order to characterize the semiconductor properties of the nanostructured NiO thin films. The experiments were also done for Eosin B- and Erythrosin J-sensitized nanostructured NiO films, with the aim to visualize their potential application as photocatodes in tandem dye-sensitized solar cells (TDSSC). The NiO grown by dipping was the one presenting the best morphological properties. The photoelectrochemical results for all the bare NiO, NiO-Eosin B and NiO-Erythrosin J/electrolyte (I 2 /I - ) systems showed a p-type behavior. An enhancement in the photocurrent has been observed for the systems sensitized with the dyes. For the NiO/Erythrosin J system the enhancement of the current under illumination in comparison to the dark current was about 200%

  7. Creep behaviour of a casting titanium carbide reinforced AlSi12CuNiMg piston alloy at elevated temperatures; Hochtemperaturkriechverhalten der schmelzmetallurgisch hergestellten dispersionsverstaerkten Kolbenlegierung AlSi12CuNiMg

    Energy Technology Data Exchange (ETDEWEB)

    Michel, S.; Scholz, A. [Zentrum fuer Konstruktionswerkstoffe, TU Darmstadt (Germany); Tonn, B. [Institut fuer Metallurgie, TU Clausthal (Germany); Zak, H.

    2012-03-15

    This paper deals with the creep behaviour of the titanium carbide reinforced AlSi12CuNiMg piston alloy at 350 C and its comparison to the conventional AlSi12Cu4Ni2MgTiZr piston alloy. With only 0,02 vol-% TiC reinforcement the creep strength and creep rupture strength of the AlSi12CuNiMg piston alloy are significantly improved and reach the level of the expensive AlSi12Cu4Ni2MgTiZr alloy. (Copyright copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  8. Ion-beam texturing of uniaxially textured Ni films

    International Nuclear Information System (INIS)

    Park, S.J.; Norton, D.P.; Selvamanickam, Venkat

    2005-01-01

    The formation of biaxial texture in uniaxially textured Ni thin films via Ar-ion irradiation is reported. The ion-beam irradiation was not simultaneous with deposition. Instead, the ion beam irradiates the uniaxially textured film surface with no impinging deposition flux, which differs from conventional ion-beam-assisted deposition. The uniaxial texture is established via a nonion beam process, with the in-plane texture imposed on the uniaxial film via ion beam bombardment. Within this sequential ion beam texturing method, grain alignment is driven by selective etching and grain overgrowth

  9. Experimental investigation and thermodynamic modeling of the Ni-Al-Ru ternary system

    International Nuclear Information System (INIS)

    Zhu, J.; Zhang, C.; Cao, W.; Yang, Y.; Zhang, F.; Chen, S.; Morgan, D.; Chang, Y.A.

    2009-01-01

    In this study, a thermodynamic description of the Ni-Al-Ru system was obtained in terms of experimental phase equilibrium data as well as first-principles-calculated energetics. The calculated isotherms and liquidus projection using this description are in accord with the experimental data obtained in the present study as well as those previously reported in the literature, and the model-calculated enthalpies of formation agree with subsequent first-principles-calculated values. During the thermodynamic modeling of the Ni-Al-Ru system, we encountered great challenges initially to account for one of the experimentally determined isotherms reported in the literature. To reconcile these discrepancies, additional experiments were carried out and the results obtained supported the phase equilibrium data reported in the literature. The model-calculated enthalpies agree with subsequent first-principles-calculated values. The approach adopted in this study using phase equilibrium data of Ni-Al-Ru and the descriptions of Ni-Al and Ni-Ru to identify errors in the enthalpy of AlRu could be a general tool that could be used for other systems

  10. Hydrogenation of naphthalene on NiMo- Ni- and Ru/Al{sub 2}O{sub 3} catalysts. Langmuir-Hinshelwood kinetic modelling

    Energy Technology Data Exchange (ETDEWEB)

    Monteiro-Gezork, Ana Cristina Alves; Winterbottom, John Mike [Department of Chemical Engineering, School of Engineering, The University of Birmingham, Birmingham B15 2TT (United Kingdom); Natividad, Reyna [Department of Chemical Engineering, Faculty of Chemistry, Universidad Autonoma del Estado de Mexico, Paseo Colon Esq. Tollocan, Toluca, Edo. de Mexico, Mexico CP 50120 (Mexico)

    2008-01-30

    The importance of the hydrodearomatisation (HDA) is increasing together with tightening legislation of fuel quality and exhaust emissions. The present study focuses on hydrogenation (HYD) kinetics of the model aromatic compound naphthalene, found in typical diesel fraction, in n-hexadecane over a NiMo (nickel molybdenum), Ni (nickel) and Ru (ruthenium) supported on trilobe alumina (Al{sub 2}O{sub 3}) catalysts. Kinetic reaction expressions based on the mechanistic Langmuir-Hinshelwood (L-H) model were derived and tested by regressing the experimental data that translated the effect of both naphthalene and hydrogen concentration at a constant temperature (523.15 and 573.15 K over the NiMo catalyst and at 373.15 K over the Ni and Ru/Al{sub 2}O{sub 3} catalysts) on the initial reaction rate. The L-H equation, giving an adequate fit to the experimental data with physically meaningful parameters, suggested a competitive adsorption between hydrogen and naphthalene over the presulphided NiMo catalyst and a non-competitive adsorption between these two reactants over the prereduced Ni and Ru/Al{sub 2}O{sub 3} catalysts. In addition, the adsorption constant values indicated that the prereduced Ru catalyst was a much more active catalyst towards naphthalene HYD than the prereduced Ni/Al{sub 2}O{sub 3} or the presulphided NiMo/Al{sub 2}O{sub 3} catalyst. (author)

  11. Surface chemistry and cytotoxicity of reactively sputtered tantalum oxide films on NiTi plates

    Energy Technology Data Exchange (ETDEWEB)

    McNamara, K. [Materials and Surface Science Institute, University of Limerick, Limerick (Ireland); Department of Physics & Energy, University of Limerick, Limerick (Ireland); Kolaj-Robin, O.; Belochapkine, S.; Laffir, F. [Materials and Surface Science Institute, University of Limerick, Limerick (Ireland); Gandhi, A.A. [Materials and Surface Science Institute, University of Limerick, Limerick (Ireland); Department of Physics & Energy, University of Limerick, Limerick (Ireland); Tofail, S.A.M., E-mail: tofail.syed@ul.ie [Materials and Surface Science Institute, University of Limerick, Limerick (Ireland); Department of Physics & Energy, University of Limerick, Limerick (Ireland)

    2015-08-31

    NiTi, an equiatomic alloy containing nickel and titanium, exhibits unique properties such as shape memory effect and superelasticity. NiTi also forms a spontaneous protective titanium dioxide (TiO{sub 2}) layer that allows its use in biomedical applications. Despite the widely perceived biocompatibility there remain some concerns about the sustainability of the alloy's biocompatibility due to the defects in the TiO{sub 2} protective layer and the presence of high amount of sub-surface Ni, which can give allergic reactions. Many surface treatments have been investigated to try to improve both the corrosion resistance and biocompatibility of this layer. For such purposes, we have sputter deposited tantalum (Ta) oxide thin films onto the surface of the NiTi alloy. Despite being one of the promising metals for biomedical applications, Ta, and its various oxides and their interactions with cells have received relatively less attention. The oxidation chemistry, crystal structure, morphology and biocompatibility of these films have been investigated. In general, reactive sputtering especially in the presence of a low oxygen mixture yields a thicker film with better control of the film quality. The sputtering power influenced the surface oxidation states of Ta. Both microscopic and quantitative cytotoxicity measurements show that Ta films on NiTi are biocompatible with little to no variation in cytotoxic response when the surface oxidation state of Ta changes. - Highlights: • Reactive sputtering in low oxygen mixture yields thicker better quality films. • Sputtering power influenced surface oxidation states of Ta. • Cytotoxicity measurements show Ta films on NiTi are biocompatible. • Little to no variation in cytotoxic response when oxidation state changes.

  12. Magnetic x-ray linear dichroism of ultrathin Fe-Ni alloy films

    Energy Technology Data Exchange (ETDEWEB)

    Schumann, F.O.; Willis, R.F. [Pennsylvania State Univ., University Park, PA (United States); Goodman, K.W. [Lawrence Berkeley National Lab., CA (United States)] [and others

    1997-04-01

    The authors have studied the magnetic structure of ultrathin Fe-Ni alloy films as a function of Fe concentration by measuring the linear dichroism of the 3p-core levels in angle-resolved photoemission spectroscopy. The alloy films, grown by molecular-beam epitaxy on Cu(001) surfaces, were fcc and approximately four monolayers thick. The intensity of the Fe dichroism varied with Fe concentration, with larger dichroisms at lower Fe concentrations. The implication of these results to an ultrathin film analogue of the bulk Invar effect in Fe-Ni alloys will be discussed. These measurements were performed at the Spectromicroscopy Facility (Beamline 7.0.1) of the Advanced Light Source.

  13. Ni{sub 3}Al technology transfer

    Energy Technology Data Exchange (ETDEWEB)

    Sikka, V.K.; Viswanathan, S.; Santella, M.L. [Oak Ridge National Lab., TN (United States)] [and others

    1997-04-01

    Ductile Ni{sub 3}Al and Ni{sub 3}Al-based alloys have been identified for a range of applications. These applications require the use of material in a variety of product forms such as sheet, plate, bar, wire, tubing, piping, and castings. Although significant progress has been made in the melting, casting, and near-net-shape forming of nickel aluminides, some issues still remain. These include the need for: (1) high-strength castable composition for many applications that have been identified; (2) castability (mold type, fluidity, hot-shortness, porosity, etc.); (3) weld reparability of castings; and (4) workability of cast or powder metallurgy product to sheet, bar, and wire. The four issues listed above can be {open_quotes}show stoppers{close_quotes} for the commercial application of nickel aluminides. This report describes the work completed to address some of these issues during FY 1996.

  14. Degradation of GaAs/AlGaAs Quantized Hall Resistors With Alloyed AuGe/Ni Contacts

    OpenAIRE

    Lee, Kevin C.

    1998-01-01

    Careful testing over a period of 6 years of a number of GaAs/AlGaAs quantized Hall resistors (QHR) made with alloyed AuGe/Ni contacts, both with and without passivating silicon nitride coatings, has resulted in the identification of important mechanisms responsible for degradation in the performance of the devices as resistance standards. Covering the contacts with a film, such as a low-temperature silicon nitride, that is impervious to humidity and other contaminants in the atmosphere preven...

  15. Computer studies of surface structure of NiAl(111)

    International Nuclear Information System (INIS)

    Takeuchi, Wataru; Yamamura, Yasunori

    1994-01-01

    The 180 neutral impact-collision ion scattering spectroscopy (NICISS) data have been analyzed using the ACOCT program code based on the binary collision approximation (BCA). The computer simulations are performed for the case of 2 keV He + ions incident along the [ anti 12 anti 1] direction of a NiAl(111) surface. It is found that the experimental results are well reproduced by the ACOCT simulations including the inward relaxation of 40% of the first interlayer spacing on Ni terminated layer at the NiAl(111) surface and including the Moliere approximation of the Thomas-Fermi potential with a reduced Firsov screening length, multiplied by a factor of 0.60. (orig.)

  16. Corrosion effect on the electrochemical properties of LaNi3.55Mn0.4Al0.3Co0.75 and LaNi3.55Mn0.4Al0.3Fe0.75 negative electrodes used in Ni-MH batteries

    International Nuclear Information System (INIS)

    Khaldi, Chokri; Boussami, Sami; Rejeb, Borhene Ben; Mathlouthi, Hamadi; Lamloumi, Jilani

    2010-01-01

    The thermodynamic parameters, electrochemical capacity, equilibrium potential and the equilibrium pressure, of LaNi 3.55 Mn 0.4 Al 0.3 Co 0.75 and LaNi 3.55 Mn 0.4 Al 0.3 Fe 0.75 alloys have been evaluated from the electrochemical isotherms (C/30 and OCV methods) and CV technique. A comparative study has been done between the parameter values deduced from the electrochemical methods and the solid-gas method. The parameter values deduced from the electrochemical methods are influenced by the electrochemical corrosion of the alloys in aqueous KOH electrolyte. The corrosion behaviour of the LaNi 3.55 Mn 0.4 Al 0.3 Co 0.75 and LaNi 3.55 Mn 0.4 Al 0.3 Fe 0.75 electrodes after activation was investigated using the method of the potentiodynamic polarization. The variation of current and potential corrosion values with the state of charge (SOC) show that the substitution of cobalt by iron accentuates the corrosion process. The high-rate dischargeability (HRD) of the LaNi 3.55 Mn 0.4 Al 0.3 Co 0.75 and LaNi 3.55 Mn 0.4 Al 0.3 Fe 0.75 alloys was examined. By increasing the discharge current the (HRD) decrease linearly for both the alloys and for the LaNi 3.55 Mn 0.4 Al 0.3 Fe 0.75 compound is greater then for the LaNi 3.55 Mn 0.4 Al 0.3 Co 0.75 one.

  17. A statistical-thermodynamic model for ordering phenomena in thin film intermetallic structures

    International Nuclear Information System (INIS)

    Semenova, Olga; Krachler, Regina

    2008-01-01

    Ordering phenomena in bcc (110) binary thin film intermetallics are studied by a statistical-thermodynamic model. The system is modeled by an Ising approach that includes only nearest-neighbor chemical interactions and is solved in a mean-field approximation. Vacancies and anti-structure atoms are considered on both sublattices. The model describes long-range ordering and simultaneously short-range ordering in the thin film. It is applied to NiAl thin films with B2 structure. Vacancy concentrations, thermodynamic activity profiles and the virtual critical temperature of order-disorder as a function of film composition and thickness are presented. The results point to an important role of vacancies in near-stoichiometric and Ni-rich NiAl thin films

  18. High thermally stable Ni /Ag(Al) alloy contacts on p-GaN

    Science.gov (United States)

    Chou, C. H.; Lin, C. L.; Chuang, Y. C.; Bor, H. Y.; Liu, C. Y.

    2007-01-01

    Ag agglomeration was found to occur at Ni /Ag to p-GaN contacts after annealing at 500°C. This Ag agglomeration led to the poor thermal stability showed by the Ni /Ag contacts in relation to the reflectivity and electrical properties. However, after alloying with 10at.% Al by e-gun deposition, the Ni /Ag(Al) p-GaN contacts were found to effectively retard Ag agglomeration thereby greatly enhancing the thermal stability. Based on the x-ray photoelectron spectroscopy analysis, the authors believe that the key for the retardation of Ag agglomeration was the formation of ternary Al-Ni-O layer at p-GaN interface.

  19. Improved conductivity of infinite-layer LaNiO2 thin films by metal organic decomposition

    International Nuclear Information System (INIS)

    Ikeda, Ai; Manabe, Takaaki; Naito, Michio

    2013-01-01

    Highlights: •LaNiO 2 films were synthesized by metal organic decomposition and topotactic reduction. •Room-temperature resistivity as low as 0.6 mΩ cm was achieved for infinite-layer LaNiO 2 . •Lattice matched substrates are important in obtaining high conductivity. -- Abstract: Infinite-layer LaNiO 2 thin films were synthesized by metal organic decomposition and subsequent topotactic reduction in hydrogen, and their transport properties were investigated. LaNiO 2 is isostructural to SrCuO 2 , the parent compound of high-T c Sr 0.9 La 0.1 CuO 2 with T c = 44 K, and has 3d 9 configuration, which is very rare in oxides but common to high-T c copper oxides. The bulk synthesis of LaNiO 2 is not easy, but we demonstrate in this article that the thin-film synthesis of LaNiO 2 is rather easy, thanks to a large-surface-to-volume ratio, which makes oxygen diffusion prompt. Our refined synthesis conditions produced highly conducting films of LaNiO 2 . The resistivity of the best film is as low as 640 μΩ cm at 295 K and decreases with temperature down to 230 K but it shows a gradual upturn at lower temperatures

  20. Structural, electronic, magnetic and optical properties of Ni,Ti/Al-based Heusler alloys. A first-principles approach

    Energy Technology Data Exchange (ETDEWEB)

    Adebambo, Paul O. [Univ. of Agriculture. Abeokuta (Nigeria). Dept. of Physics; McPherson Univ., Abeokuta (Nigeria). Dept. of Physical and Computer Sciences; Adetunji, Bamidele I. [Univ. of Agriculture. Abeokuta (Nigeria). Dept. of Physics; Bells Univ. of Technology, Oto (Nigeria). Dept. of Mathematics; Olowofela, Joseph A. [Univ. of Agriculture. Abeokuta (Nigeria). Dept. of Physics; Oguntuase, James A. [Univ. of Agriculture. Abeokuta (Nigeria). Dept. of Mathematics; Adebayo, Gboyega A. [Univ. of Agriculture. Abeokuta (Nigeria). Dept. of Physics; Abdus Salam International Centre for Theoretical Physics, Trieste (Italy)

    2016-05-01

    In this work, detailed first-principles calculations within the generalised gradient approximation (GGA) of electronic, structural, magnetic, and optical properties of Ni,Ti, and Al-based Heusler alloys are presented. The lattice parameter of C1{sub b} with space group F anti 43m (216) NiTiAl alloys is predicted and that of Ni{sub 2}TiAl is in close agreement with available results. The band dispersion along the high symmetry points W→L→Γ→X→W→K in Ni{sub 2}TiAl and NiTiAl Heusler alloys are also reported. NiTiAl alloy has a direct band gap of 1.60 eV at Γ point as a result of strong hybridization between the d state of the lower and higher valence of both the Ti and Ni atoms. The calculated real part of the dielectric function confirmed the band gap of 1.60 eV in NiTiAl alloys. The present calculations revealed the paramagnetic state of NiTiAl. From the band structure calculations, Ni{sub 2}TiAl with higher Fermi level exhibits metallic properties as in the case of both NiAl and Ni{sub 3}Al binary systems.

  1. High-pressure x-ray diffraction of icosahedral Zr-Al-Ni-Cu-Ag quasicrystals

    DEFF Research Database (Denmark)

    Jiang, Jianzhong; Saksl, Karel; Rasmussen, Helge Kildahl

    2001-01-01

    temperature using synchrotron radiation. The icosahedral quasicrystal structure is retained up to the highest hydrostatic pressure used (approximately 28 GPa) and is reversible after decompression. The bulk modulus at zero pressure and its pressure derivative of the icosahedral Zr-Al-Ni-Cu-Ag quasicrystal......The effect of pressure on the structural stability of icosahedral Zr-Al-Ni-Cu-Ag quasicrystals forming from a Zr65Al7.5Ni10Cu7.5Ag10 metallic glass with a supercooled liquid region of 44 K has been investigated by in situ high-pressure angle-dispersive x-ray powder diffraction at ambient......-Al-Ni-Cu-Ag quasicrystals induced by pressure....

  2. Density of liquid NiCoAlCr quarternary alloys measured by modified sessile drop method

    Institute of Scientific and Technical Information of China (English)

    FANG Liang; ZHANG Shu-fang; XIAO Feng; YANG Ling-chuan; DONG Jian-xin; CAO Chun-lan; TAO Zai-nan; K. MUKAI

    2006-01-01

    The densities of liquid NiCoAlCr quaternary alloys with a fixed molar ratio of Ni to Co to Al (x(Ni)-x(Co)-x(Al)≈73-12-15) which is close to the average value of the commercial Ni-based superalloys TMS75, INCO713, CM247LC and CMSX-4, and the mass fraction of chromium changes from 0 to 9% were measured by a modified sessile drop method. It is found that with increasing temperature and chromium concentration in the alloys, the densities of the liquid NiCoAlCr quaternary alloys decrease, whereas the molar volume of the liquid NiCoAlCr quaternary alloys increases. And the liquid densities of NiCoAlCr quaternary alloys calculated from the partial molar volumes of nickel, cobalt, aluminum and chromium in the corresponding Ni-bases binary alloys are in good agreement with the experimental ones, i.e. within the error tolerance range the densities of the liquid Ni-based multi-component alloys can be predicted from the partial volumes of elements in Ni-based binary alloys in liquid state. The molar volume of liquid NiCoAlCr binary alloy shows a negative deviation from the ideal linear mixing and the deviation changes small with the increase of chromium concentration at the same temperature.

  3. Fabrication of Ni-Al/diamond composite based on layered and gradient structures of SHS system

    Directory of Open Access Journals (Sweden)

    Lu Jiafeng

    2017-01-01

    Full Text Available In this paper layered and gradient structures of Ni-Al SHS system were adopted to manufacture Ni-Al/diamond composites. The effect of the layered and the diamond mesh gradient structures of Ni-Al/diamond on the SHS process and the microstructure of the composites were investigated. It is found that with the increasing of the number of layers, the combustion wave velocity is decreased. The combustion wave velocity for diamond mesh size gradient structure of Ni-Al SHS is faster than that for the layered structure. A well bonding can be formed between diamond and the matrix in layered and gradient structure Ni-Al/diamond composites due to the melt of Ni-Cr brazing alloy.

  4. Structural characterization of PbTi03, Sm0.6Nd0.4NiO3 and NdMnO3 multifunctional Perovskite thin films

    Directory of Open Access Journals (Sweden)

    Rapenne L.

    2012-06-01

    Full Text Available Different multifunctional (PbTiO3, Sm0.6Nd0.4NiO3, NdMnO3 thin films were grown by metalorganic chemical vapor deposition (MOCVD technique on SrTiO3 and LaAlO3 substrates. TEM and X-ray diffraction measurements reveal that almost single crystalline thin films can be epitaxially grown on the top of substrates. The relationship between the crystallographic orientation of the films and those of the substrates were determined by reciprocal space mapping and TEM analyses. PbTi03 thin films appear to be under tensile or compressive strain according to the different mismatch of their cell parameter with those of the substrate. Relaxation mechanism as a function of the film thickness arises from coexistence of different type of domains and size and strain effect are analyzed. SmNiO3 thin films present diffuse scattering strikes and are less well organized when compared to PbTi03 thin films. Different domains are observed as well as an additional parasitic phase close to NiO. Its regular distribution can be associated to reduced transport properties. Preliminary observations on NdMnO3 thin films show that an amorphous phase is obtained during MOCVD that can be transformed in a single crystalline film by annealing. The films are under tensile or compressive strain according to the different mismatch of their cell parameter with those of the substrate. Magnetic properties are investigated.

  5. Highly spectrum-selective ultraviolet photodetector based on p-NiO/n-IGZO thin film heterojunction structure.

    Science.gov (United States)

    Li, H K; Chen, T P; Hu, S G; Li, X D; Liu, Y; Lee, P S; Wang, X P; Li, H Y; Lo, G Q

    2015-10-19

    Ultraviolet photodetector with p-n heterojunction is fabricated by magnetron sputtering deposition of n-type indium gallium zinc oxide (n-IGZO) and p-type nickel oxide (p-NiO) thin films on ITO glass. The performance of the photodetector is largely affected by the conductivity of the p-NiO thin film, which can be controlled by varying the oxygen partial pressure during the deposition of the p-NiO thin film. A highly spectrum-selective ultraviolet photodetector has been achieved with the p-NiO layer with a high conductivity. The results can be explained in terms of the "optically-filtering" function of the NiO layer.

  6. Hydrothermal fabrication of Ni{sub 3}S{sub 2}/TiO{sub 2} nanotube composite films on Ni anode and application in photoassisted water electrolysis

    Energy Technology Data Exchange (ETDEWEB)

    He, Hongbo; Chen, Aiping, E-mail: apchen@ecust.edu.cn; Lv, Hui; Dong, Haijun; Chang, Ming; Li, Chunzhong

    2013-10-15

    Highlights: •Ni{sub 3}S{sub 2}/TiO{sub 2} nanotube photocatalysts were synthesized on Ni by hydrothermal method. •Structure of Ni{sub 3}S{sub 2} wrapped by TiO{sub 2} nanotubes improves remarkably stability of Ni{sub 3}S{sub 2}. •Ni{sub 3}S{sub 2}/TiO{sub 2} film on Ni has better H{sub 2} production performance than TiO{sub 2}-modified anode. -- Abstract: Nanostructured films of rhombohedral Ni{sub 3}S{sub 2} were hydrothermally synthesized on Ni and TiO{sub 2} nanotube layer, as substrates. A possible mechanism is proposed to explain the formation of rhombohedral Ni{sub 3}S{sub 2} nanostructures. The results of UV–vis spectrophotometric studies indicate that optical absorption spectrum of Ni{sub 3}S{sub 2}/TiO{sub 2} nanotube composites could be extended to the visible region. As-synthesized Ni{sub 3}S{sub 2}/TiO{sub 2} nanotube composite films on Ni substrate had better (by about 40%) hydrogen production performance under the visible light irradiation, in comparison with the Ni anode modified by TiO{sub 2} nanotubes.

  7. Improved conductivity of infinite-layer LaNiO2 thin films by metal organic decomposition

    Science.gov (United States)

    Ikeda, Ai; Manabe, Takaaki; Naito, Michio

    2013-12-01

    Infinite-layer LaNiO2 thin films were synthesized by metal organic decomposition and subsequent topotactic reduction in hydrogen, and their transport properties were investigated. LaNiO2 is isostructural to SrCuO2, the parent compound of high-Tc Sr0.9La0.1CuO2 with Tc = 44 K, and has 3d9 configuration, which is very rare in oxides but common to high-Tc copper oxides. The bulk synthesis of LaNiO2 is not easy, but we demonstrate in this article that the thin-film synthesis of LaNiO2 is rather easy, thanks to a large-surface-to-volume ratio, which makes oxygen diffusion prompt. Our refined synthesis conditions produced highly conducting films of LaNiO2. The resistivity of the best film is as low as 640 μΩ cm at 295 K and decreases with temperature down to 230 K but it shows a gradual upturn at lower temperatures.

  8. Oxidation behavior of HVOF sprayed Ni-5Al coatings deposited on Ni- and Fe-based superalloys under cyclic condition

    International Nuclear Information System (INIS)

    Mahesh, R.A.; Jayaganthan, R.; Prakash, S.

    2008-01-01

    Ni-5Al coating was obtained on three superalloy substrates viz. Superni 76, Superni 750 and Superfer 800 using high velocity oxy-fuel (HVOF) spray process. Oxidation studies were carried out on both bare and coated superalloy substrates in air at 900 deg. C for 100 cycles. The weight change was measured at the end of each cycle and observed that the weight gain was high in Superni 750 alloy when compared to Superni 76 and Superfer 800. A nearly parabolic oxidation behavior was observed for Ni-5Al coated Superni 750 and Superfer 800 alloys but a Ni-5Al coated Superni 76 substrate showed a slight deviation. The scale was analysed using X-ray diffraction (XRD), scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDAX) and electron probe microanalysis (EPMA). The coating increased the oxidation resistance for all the alloy substrates at 900 deg. C. Among the three-coated superalloys, Superfer 800 substrate has shown the best resistance to oxidation. The protective nature of the Ni-5Al coated superalloys was due to the formation of protective oxide scales such as NiO, Al 2 O 3 and Cr 2 O 3

  9. Effect of grain size on yield strength of Ni3Al and other alloys

    International Nuclear Information System (INIS)

    Takeyama, M.; Liu, C.T.

    1988-01-01

    This paper analyzes the effect of grain size on yield stress of ordered Ni 3 Al and Zr 3 Al, and mild steels that show Lueders band propagation after yielding, using the Hall--Petch relation, σ/sub y/ = σ 0 +k/sub y/ d -1 /sup // 2 , and the new relation proposed by Schulson et al., σ/sub y/ = σ 0 +kd/sup -(//sup p//sup +1)/2/ [Schulson et al., Acta Metall. 33, 1587 (1985)]. The major emphasis is placed on the analysis of Ni 3 Al data obtained from published and new results, with a careful consideration of the alloy stoichiometry effect. All data, except for binary stoichiometric Ni 3 Al prepared by powder extrusion, fit the Hall--Petch relation, whereas the data from boron-doped Ni 3 Al and mild steels do not follow the Schulson relation. However, no conclusion can be made simply from the curve fitting using either relation. The results are also discussed in terms of Lueders strain and alloy preparation methods. On the basis of the Hall--Petch analysis, the small slope k/sub y/ is obtained only for hypostoichiometric Ni 3 Al with boron, which would be related to a stronger segregation of boron in nickel-rich Ni 3 Al. In addition, the potency for the solid solution strengthening effect of boron is found to be much higher for stoichiometric Ni 3 Al than for hypostoichiometric alloys

  10. Pseudomorphic-to-bulk fcc phase transition of thin Ni films on Pd(100)

    International Nuclear Information System (INIS)

    Rizzi, G.A.; Petukhov, M.; Sedona, F.; Granozzi, G.; Cossaro, A.; Bruno, F.; Cvetko, D.; Morgante, A.; Floreano, L.

    2004-01-01

    We have measured the transformation of pseudomorphic Ni films on Pd(100) into their bulk fcc phase as a function of the film thickness. We made use of x-ray diffraction and x-ray induced photoemission to study the evolution of the Ni film and its interface with the substrate. The growth of a film with tetragonally strained face centered symmetry (fct) has been observed by out-of-plane x-ray diffraction up to a limit thickness of 10 Ni pseudomorphic layers (some of them partially filled and intermixed with the substrate), where a new fcc bulklike phase is formed. After the formation of the bulklike Ni domains, we observed the pseudomorphic fct domains to disappear preserving the number of layers and their spacing. The phase transition thus proceeds via lateral growth of the bulklike phase within the pseudomorphic one, i.e., the bulklike fcc domains penetrate down to the substrate when formed. This large depth of the walls separating the domains of different phases is also indicated by the increase of the intermixing at the substrate-film interface, which starts at the onset of the transition and continues at even larger thickness. The bulklike fcc phase is also slightly strained; its relaxation towards the orthomorphic lattice structure proceeds slowly with the film thickness, being not yet completed at the maximum thickness presently studied of 30 A (∼17 layers)

  11. Effect of iron content on the structure and mechanical properties of Al25Ti25Ni25Cu25 and (AlTi)60-xNi20Cu20Fex (x=15, 20) high-entropy alloys

    International Nuclear Information System (INIS)

    Fazakas, É.; Zadorozhnyy, V.; Louzguine-Luzgin, D.V.

    2015-01-01

    Highlights: • Three new refractory alloys namely: Al 25 Ti 25 Ni 25 Cu 25 , Al 22.5 Ti 22.5 Ni 20 Cu 20 Fe 15 and Al 20 Ti 20 Ni 20 Cu 20 Fe 20 , were produced by induction-melting and casting. • This kind of alloys exhibits high resistance to annealing softening. • Most the alloys in the annealed state possess even higher Vickers microhardness than the as-cast alloys. • The Al 22.5 Ti 22.5 Ni 20 Cu 20 Fe 15 and Al 20 Ti 20 Ni 20 Cu 20 Fe 20 alloys annealed at 973 K show the highest compressive stress and ductility values. - Abstract: In this work, we investigated the microstructure and mechanical properties of Al 25 Ti 25 Ni 25 C u25 Al 22.5 Ti 22.5 Ni 20 Cu 20 Fe 15 and Al 20 Ti 20 Ni 20 Cu 20 Fe 20 high entropy alloys, produced by arc melting and casting in an inert atmosphere. The structure of these alloys was studied by X-ray diffractometry and scanning electron microscopy. The as-cast alloys were heat treated at 773, 973 and 1173 K for 1800 s to investigate the effects of aging on the plasticity, hardness and elastic properties. Compared to the conventional high-entropy alloys the Al 25 Ti 25 Ni 25 Cu 25 , Al 22.5 Ti 22.5 Ni 20 Cu 20 Fe 15 and Al 20 Ti 20 Ni 20 Cu 20 Fe 20 alloys are relatively hard and ductile. Being heat treated at 973 K the Al 22.5 Ti 22.5 Ni 20 Cu 20 Fe 15 alloy shows considerably high strength and relatively homogeneous deformation under compression. The plasticity, hardness and elastic properties of the studied alloys depend on the fraction and intrinsic properties of the constituent phases. Significant hardening effect by the annealing is found.

  12. A first-principles study of B2 NiAl alloyed with rare earth elements Pr, Pm, Sm, and Eu

    Institute of Scientific and Technical Information of China (English)

    He Jun-Qi; Wang You; Yan Mu-Fu; Pan Zhao-Yi; Guo Li-Xin

    2013-01-01

    The structural,elastic,and electronic properties of NiAl alloyed with rare earth elements Pr,Pm,Sm,and Eu are investigated by using density functional theory (DFT).The study suggests that Pr,Pm,Sm,and Eu all tend to be substituted for an Al site.Ni8Al7Pm possesses the largest ductility.Only the hardness and ductility of Ni8Al7Eu are enhanced simultaneously.The covalency strength of the Ni-Al bond in Ni8Al7Pm is higher than that in Ni8Al7Eu.The covalency strength of an Al-Al bond and that of a Ni-Ni bond in Ni8Al7Eu are higher than that in Ni8Al7Pm.The Ni-Pm bond and the Ni-Eu bond are covalent,and the covalency strength of the Ni-Pm bond is greater.The Al-Pm bond and the Al-Eu bond show great covalency strength and ionicity,respectively.

  13. On the competition in phase formation during the crystallisation of Al-Ni-Y metallic glasses

    International Nuclear Information System (INIS)

    Styles, M.J.; Sun, W.W.; East, D.R.; Kimpton, J.A.; Gibson, M.A.; Hutchinson, C.R.

    2016-01-01

    Glassy metals exhibit a range of interesting properties including high strength and corrosion resistance, but often have poor toughness and tensile ductility in the fully amorphous state. It has been shown that combinations of desirable properties can be achieved by the partial crystallisation of glass-forming alloys, either during controlled solidification or by annealing a fully amorphous glass. The aim of this investigation is to understand the competition in phase formation during the crystallisation of metallic glasses in the Al-Ni-Y system. High-resolution, in situ synchrotron powder diffraction has been used to quantitatively follow the evolution of phases in 5 different alloys between Al 87 Ni 9 Y 4 and Al 75 Ni 15 Y 10 , as they were continuously heated to melting and subsequently cooled back to ambient temperature. Upon heating, the first crystallisation product was found to vary from FCC Al to the intermetallic Al 9 Ni 2 phase with increasing Ni concentration. In addition, the crystallisation sequence also changed from a two-stage to a three-stage process. High number densities of crystallites (∼10 23  m −3 ) were observed initially for both FCC Al and Al 9 Ni 2 . Upon cooling, the partially disordered Al 9 Ni 3 Y phase was found to form preferentially over the intermetallic phases observed during heating. The difference in competition in phase formation during heating and cooling are discussed in terms of nucleation barriers calculated using a recent thermodynamic assessment of the Al-Ni-Y system. The role of compositional heterogeneities in the as-quenched glasses and long-range diffusion on the nucleation process is discussed. - Graphical abstract: High-resolution, in situ synchrotron powder diffraction has been used to quantitatively follow the evolution of phases in 5 different alloys between Al 87 Ni 9 Y 4 and Al 75 Ni 15 Y 10 , as they were continuously heated to melting and subsequently cooled back to ambient temperature. Upon heating, the

  14. Structure, magnetic ordering, and spin filtering efficiency of NiFe{sub 2}O{sub 4}(111) ultrathin films

    Energy Technology Data Exchange (ETDEWEB)

    Matzen, S.; Moussy, J.-B., E-mail: jean-baptiste.moussy@cea.fr [CEA, IRAMIS, SPCSI, F-91191 Gif-sur-Yvette (France); Wei, P. [Francis Bitter Magnet Laboratory, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 (United States); Gatel, C. [CEMES-CNRS, F-31055 Toulouse (France); Cezar, J. C. [ESRF, F-38043 Grenoble (France); Arrio, M. A.; Sainctavit, Ph. [IMPMC, F-75015 Paris (France); Moodera, J. S. [Francis Bitter Magnet Laboratory, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 (United States); Physics Department, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 (United States)

    2014-05-05

    NiFe{sub 2}O{sub 4}(111) ultrathin films (3–5 nm) have been grown by oxygen-assisted molecular beam epitaxy and integrated as effective spin-filter barriers. Structural and magnetic characterizations have been performed in order to investigate the presence of defects that could limit the spin filtering efficiency. These analyses have revealed the full strain relaxation of the layers with a cationic order in agreement with the inverse spinel structure but also the presence of antiphase boundaries. A spin-polarization up to +25% has been directly measured by the Meservey-Tedrow technique in Pt(111)/NiFe{sub 2}O{sub 4}(111)/γ-Al{sub 2}O{sub 3}(111)/Al tunnel junctions. The unexpected positive sign and relatively small value of the spin-polarization are discussed, in comparison with predictions and previous indirect tunnelling magnetoresistance measurements.

  15. Effect of Nano-Ni Catalyst on the Growth and Characterization of Diamond Films by HFCVD

    Directory of Open Access Journals (Sweden)

    Chien-Chung Teng

    2010-01-01

    Full Text Available Four different catalysts, nanodiamond seed, nano-Ni, diamond powder, and mixture of nano-Ni/diamond powder, were used to activate Si wafers for diamond film growth by hot-filament CVD (HFCVD. Diamond crystals were shown to grow directly on both large diamond powder and small nanodiamond seed, but a better crystallinity of diamond film was observed on the ultrasonicated nanodiamond seeded Si substrate. On the other hand, nano-Ni nanocatalysts seem to promote the formation of amorphous carbon but suppress transpolyacetylene (t-PA phases at the initial growth of diamond films. The subsequent nucleation and growth of diamond crystals on the amorphous carbon layer leads to generation of the spherical diamond particles and clusters prior to coalescence into continuous diamond films based on the CH3 addition mechanism as characterized by XRD, Raman, ATR/FT-IR, XPS, TEM, SEM, and AFM techniques. Moreover, a 36% reduction in surface roughness of diamond film assisted by nano-Ni catalyst is quite significant.

  16. Electronic structure and magnetic properties of Ni-doped SnO2 thin films

    Science.gov (United States)

    Sharma, Mayuri; Kumar, Shalendra; Alvi, P. A.

    2018-05-01

    This paper reports the electronic structure and magnetic properties of Ni-doped SnO2 thin film which were grown on Si (100) substrate by PLD (pulse laser deposition) technique under oxygen partial pressure (PO2). For getting electronic structure and magnetic behavior, the films were characterized using near edge X-ray absorption fine structure spectroscopy (NEXAFS) and DC magnetization measurements. The NEXAFS study at Ni L3,2 edge has been done to understand the local environment of Ni and Sn ions within SnO2 lattice. DC magnetization measurement shows that the saturation magnetization increases with the increase in substitution of Ni2+ ions in the system.

  17. Effect of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates

    International Nuclear Information System (INIS)

    Oh, Dohyun; No, Young Soo; Kim, Su Youn; Cho, Woon Jo; Kwack, Kae Dal; Kim, Tae Whan

    2011-01-01

    Research highlights: The CuAlO 2 /Ag/CuAlO 2 multilayer films were grown on glass substrates using radio-frequency magnetron sputtering at room temperature. Effects of Ag film thickness on the optical and the electrical properties in CuAlO 2 /Ag/CuAlO 2 multilayer films grown on glass substrates were investigated. X-ray diffraction patterns showed that the phase of the CuAlO 2 layer was amorphous. Atomic force microscopy images showed that Ag films with a thickness of a few nanometers had island structures. The morphology Ag films with a thickness of 8 nm was uniform. The morphology of the Ag films inserted in the CuAlO 2 films significantly affected the optical transmittance and the resistivity of the CuAlO 2 films deposited on glass substrates. The maximum transmittance of the CuAlO 2 /Ag/CuAlO 2 multilayer films with a thickness of 8 nm was 89.16%. The resistivity of the CuAlO 2 /Ag/CuAlO 2 multilayer films with an Ag film thickness of 18 nm was as small as about 2.8 x 10 -5 Ω cm. The resistivity of the CuAlO 2 /Ag/CuAlO 2 multilayer films was decreased as a result of the thermal annealing treatment. These results indicate that CuAlO 2 /Ag/CuAlO 2 multilayer films grown on glass substrates hold promise for potential applications as TCO films in solar cells. - Abstract: Effects of Ag film thickness on the optical and the electrical properties in CuAlO 2 /Ag/CuAlO 2 multilayer films grown on glass substrates were investigated. Atomic force microscopy images showed that Ag films with a thickness of a few nanometers had island structures. X-ray diffraction patterns showed that the phase of the CuAlO 2 layer was amorphous. The resistivity of the 40 nm-CuAlO 2 /18 nm-Ag/40 nm-CuAlO 2 multilayer films was 2.8 x 10 -5 Ω cm, and the transmittance of the multilayer films with an Ag film thickness of 8 nm was approximately 89.16%. These results indicate that CuAlO 2 /Ag/CuAlO 2 multilayer films grown on glass substrates hold promise for potential applications as

  18. AlN piezoelectric films for sensing and actuation

    NARCIS (Netherlands)

    Tran, A.T.

    2014-01-01

    Aluminum Nitride (AlN) is explored as a thin film material for piezoelectric MEMS applications. A pulse DC reactive sputtering technique is used to deposit the AlN thin films and process parameters are optimized to obtain good crystallinity and high c-axis orientation films. A CMOS compatible

  19. Enhancing pitting corrosion resistance of Al{sub x}CrFe{sub 1.5}MnNi{sub 0.5} high-entropy alloys by anodic treatment in sulfuric acid

    Energy Technology Data Exchange (ETDEWEB)

    Lee, C.P.; Chen, Y.Y.; Hsu, C.Y.; Yeh, J.W. [Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 300, Taiwan (China); Shih, H.C. [Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 300, Taiwan (China); Institute of Materials Science and Nanotechnology, Chinese Culture University, Taipei 111, Taiwan (China)], E-mail: hcshih@mx.nthu.edu.tw

    2008-12-01

    High-entropy alloys are a newly developed family of multi-component alloys that comprise various major alloying elements. Each element in the alloy system is present in between 5 and 35 at.%. The crystal structures and physical properties of high-entropy alloys differ completely from those of conventional alloys. The electrochemical impedance spectra (EIS) of the Al{sub x}CrFe{sub 1.5}MnNi{sub 0.5} (x = 0, 0.3, 0.5) alloys, obtained in 0.1 M HCl solution, clearly revealed that the corrosion resistance values were determined to increase from 21 to 34 {omega}cm{sup 2} as the aluminum content increased from 0 to 0.5 mol, and were markedly lower than that of 304 stainless steel (243 {omega}cm{sup 2}). At passive potential, the corresponding current declined with the anodizing time accounting, causing passivity by the growth of the multi-component anodized film in H{sub 2}SO{sub 4} solution. X-ray photoelectron spectroscopy (XPS) analyses revealed that the surface of anodized Al{sub 0.3}CrFe{sub 1.5}MnNi{sub 0.5} alloy formed aluminum and chromium oxide film which was the main passivating compound on the alloy. This anodic treatment increased the corrosion resistance in the EIS measurements of the CrFe{sub 1.5}MnNi{sub 0.5} and Al{sub 0.3}CrFe{sub 1.5}MnNi{sub 0.5} alloys by two orders of magnitude. Accordingly, the anodic treatment of the Al{sub x}CrFe{sub 1.5}MnNi{sub 0.5} alloys optimized their surface structures and minimized their susceptibility to pitting corrosion.

  20. Theoretical analysis of compatibility of several reinforcement materials with NiAl and FeAl matrices

    Science.gov (United States)

    Misra, Ajay K.

    1989-01-01

    Several potential reinforcement materials were assessed for their chemical, coefficient of thermal expansion (CTE), and mechanical compatibility with the intermetallic matrices based on NiAl and FeAl. Among the ceramic reinforcement materials, Al2O3, TiC, and TiB2, appear to be the optimum choices for NiAl and FeAl matrices. However, the problem of CTE mismatch with the matrix needs to be solved for these three reinforcement materials. Beryllium-rich intermetallic compounds can be considered as potential reinforcement materials provided suitable reaction barrier coatings can be developed for these. Based on preliminary thermodynamic calculations, Sc2O3 and TiC appear to be suitable as reaction barrier coatings for the beryllides. Several reaction barrier coatings are also suggested for the currently available SiC fibers.

  1. Transition between periodic and quasiperiodic structures in Al-Ni-Co

    International Nuclear Information System (INIS)

    Grushko, B.; Wittmann, R.

    1998-01-01

    A series of Al-Ni-Co alloys forming stable decagonal (D-ANC) quasicrystals was studied in as-cast and annealed states. It was shown that under certain conditions periodic structures with pseudodecagonal (PD) symmetry can be produced at the same compositions as stable decagonal quasicrystals. Different variants of D-ANC and PD were observed in a compositional range of 70-72.5 at.% Al and 13-18 at.% Co. As-cast D-ANC can be transformed to single-phase PD of the same local composition. Single-phase PDs can be transformed to D-ANC of the same composition by heating to a temperature higher than the formation temperature of these PDs. The transition between PD and D-ANC was studied in more detail in Al 71 Ni 14.5 Co 14.5 and Al 70 Ni 15 Co 15 by electron microscopy, powder X-ray diffractometry and differential thermal analysis. The results of this study do not confirm the thermodynamic stability of this PD structure. (orig.)

  2. Magneto-thermoelectric effects in NiFe thin films

    Energy Technology Data Exchange (ETDEWEB)

    Schmid, Maximilian

    2015-11-01

    In this thesis magneto-thermoelectric effects are investigated in a systematic way to separate the transverse spin Seebeck effect from other parasitic effects like the anomalous Nernst effect. In contrast to the first studies found in the literature, in NiFe thin films a contribution of the transverse spin Seebeck effect can be excluded. This surprising outcome was crosschecked in a variety of different sample layouts and collaborations with other universities to ensure the validity of these results. In general, this thesis solves a long time discussion about the existence of the transverse spin Seebeck effect in NiFe films and supports the importance of control measurements for the scientific community. Even if such ''negative'' results may not be the award winning ones, new discoveries should be treated with constructive criticism and be checked carefully by the scientific community.

  3. Epitaxial growth of fcc-CoxNi100-x thin films on MgO(110) single-crystal substrates

    International Nuclear Information System (INIS)

    Ohtake, Mitsuru; Nukaga, Yuri; Sato, Yoichi; Futamoto, Masaaki; Kirino, Fumiyoshi

    2009-01-01

    Co x Ni 100-x (x=100, 80, 20, 0 at. %) epitaxial thin films were prepared on MgO(110) single-crystal substrates heated at 300 deg. C by ultrahigh vacuum molecular beam epitaxy. The growth mechanism is discussed based on lattice strain and crystallographic defects. CoNi(110) single-crystal films with a fcc structure are obtained for all compositions. Co x Ni 100-x film growth follows the Volmer-Weber mode. X-ray diffraction analysis indicates that the out-of-plane and the in-plane lattice spacings of the Co x Ni 100-x films are in agreement within ±0.5% with the values of the respective bulk Co x Ni 100-x crystals, suggesting that the strain in the film is very small. High-resolution cross-sectional transmission microscopy shows that an atomically sharp boundary is formed between a Co(110) fcc film and a MgO(110) substrate, where periodical misfit dislocations are preferentially introduced in the film at the Co/MgO interface. The presence of such periodical misfit dislocations relieves the strain caused by the lattice mismatch between the film and the substrate.

  4. Fabrication of nickel oxide and Ni-doped indium tin oxide thin films using pyrosol process

    International Nuclear Information System (INIS)

    Nakasa, Akihiko; Adachi, Mami; Usami, Hisanao; Suzuki, Eiji; Taniguchi, Yoshio

    2006-01-01

    Organic light emitting diodes (OLEDs) need indium tin oxide (ITO) anodes with highly smooth surface. The work function of ITO, about 4.8 eV, is generally rather lower than the optimum level for application to OLEDs. In this work, NiO was deposited by pyrosol process on pyrosol ITO film to increase the work function of the ITO for improving the performance of OLEDs. It was confirmed that NiO was successfully deposited on pyrosol ITO film and the NiO deposition increased the work function of pyrosol ITO, using X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM) and atmospheric photoelectron spectroscopy. Furthermore, doping ITO with Ni succeeded in producing the Ni-doped ITO film with high work function and lower sheet resistance

  5. Crystallization and growth of Ni-Si alloy thin films on inert and on silicon substrates

    Science.gov (United States)

    Grimberg, I.; Weiss, B. Z.

    1995-04-01

    The crystallization kinetics and thermal stability of NiSi2±0.2 alloy thin films coevaporated on two different substrates were studied. The substrates were: silicon single crystal [Si(100)] and thermally oxidized silicon single crystal. In situ resistance measurements, transmission electron microscopy, x-ray diffraction, Auger electron spectroscopy, and Rutherford backscattering spectroscopy were used. The postdeposition microstructure consisted of a mixture of amorphous and crystalline phases. The amorphous phase, independent of the composition, crystallizes homogeneously to NiSi2 at temperatures lower than 200 °C. The activation energy, determined in the range of 1.4-2.54 eV, depends on the type of the substrate and on the composition of the alloyed films. The activation energy for the alloys deposited on the inert substrate was found to be lower than for the alloys deposited on silicon single crystal. The lowest activation energy was obtained for nonstoichiometric NiSi2.2, the highest for NiSi2—on both substrates. The crystallization mode depends on the structure of the as-deposited films, especially the density of the existing crystalline nuclei. Substantial differences were observed in the thermal stability of the NiSi2 compound on both substrates. With the alloy films deposited on the Si substrate, only the NiSi2 phase was identified after annealing to temperatures up to 800 °C. In the films deposited on the inert substrate, NiSi and NiSi2 phases were identified when the Ni content in the alloy exceeded 33 at. %. The effects of composition and the type of substrate on the crystallization kinetics and thermal stability are discussed.

  6. HRTEM study of the nanocrystalline Al85Y10Ni5 alloy

    International Nuclear Information System (INIS)

    Kozubowski, J.A.; Latuch, J.

    1999-01-01

    Nanocrystalline alloy Al 85 Y 10 Ni 5 obtained by annealing of the amorphous ribbons formed by melt spinning was studied by transmission electron microscopy and energy dispersive X-ray spectroscopy (EDS). The combined use of electron diffraction, electron microscopy and EDS has revealed the presence of several nano-phases: separate grains of Al(Y) and Al(N) solid solutions Al 3 Y grains and an unidentified phase of composition close to Al 3 (Ni,Y). (author)

  7. Metal thin film growth on multimetallic surfaces: From quaternary metallic glass to binary crystal

    Energy Technology Data Exchange (ETDEWEB)

    Jing, Dapeng [Iowa State Univ., Ames, IA (United States)

    2010-01-01

    The work presented in this thesis mainly focuses on the nucleation and growth of metal thin films on multimetallic surfaces. First, we have investigated the Ag film growth on a bulk metallic glass surface. Next, we have examined the coarsening and decay of bilayer Ag islands on NiAl(110) surface. Third, we have investigated the Ag film growth on NiAl(110) surface using low-energy electron diffraction (LEED). At last, we have reported our investigation on the epitaxial growth of Ni on NiAl(110) surface. Some general conclusions can be drawn as follows. First, Ag, a bulk-crystalline material, initially forms a disordered wetting layer up to 4-5 monolayers on Zr-Ni-Cu-Al metallic glass. Above this coverage, crystalline 3D clusters grow, in parallel with the flatter regions. The cluster density increases with decreasing temperature, indicating that the conditions of island nucleation are far-from-equilibrium. Within a simple model where clusters nucleate whenever two mobile Ag adatoms meet, the temperature-dependence of cluster density yields a (reasonable) upper limit for the value of the Ag diffusion barrier on top of the Ag wetting layer of 0.32 eV. Overall, this prototypical study suggests that it is possible to grow films of a bulk-crystalline metal that adopt the amorphous character of a glassy metal substrate, if film thickness is sufficiently low. Next, the first study of coarsening and decay of bilayer islands has been presented. The system was Ag on NiAl(110) in the temperature range from 185 K to 250 K. The coarsening behavior, has some similarities to that seen in the Ag(110) homoepitaxial system studied by Morgenstern and co-workers. At 185 K and 205 K, coarsening of Ag islands follows a Smoluchowski ripening pathway. At 205 K and 250 K, the terrace diffusion limited Ostwald ripening dominants. The experimental observed temperature for the transition from SR to OR is 205 K. The SR exhibits anisotropic island diffusion and the OR exhibits 1D decay of island

  8. Effect of Substrate Roughness on Adhesion and Structural Properties of Ti-Ni Shape Memory Alloy Thin Film.

    Science.gov (United States)

    Kim, Donghwan; Lee, Hyunsuk; Bae, Joohyeon; Jeong, Hyomin; Choi, Byeongkeun; Nam, Taehyun; Noh, Jungpil

    2018-09-01

    Ti-Ni shape memory alloy (SMA) thin films are very attractive material for industrial and medical applications such as micro-actuator, micro-sensors, and stents for blood vessels. An important property besides shape memory effect in the application of SMA thin films is the adhesion between the film and the substrate. When using thin films as micro-actuators or micro-sensors in MEMS, the film must be strongly adhered to the substrate. On the other hand, when using SMA thin films in medical devices such as stents, the deposited alloy thin film must be easily separable from the substrate for efficient processing. In this study, we investigated the effect of substrate roughness on the adhesion of Ti-Ni SMA thin films, as well as the structural properties and phase-transformation behavior of the fabricated films. Ti-Ni SMA thin films were deposited onto etched glass substrates with magnetron sputtering. Radio frequency plasma was used for etching the substrate. The adhesion properties were investigated through progressive scratch test. Structural properties of the films were determined via Feld emission scanning electron microscopy, X-ray diffraction measurements (XRD) and Energy-dispersive X-ray spectroscopy analysis. Phase transformation behaviors were observed with differential scanning calorimetry and low temperature-XRD. Ti-Ni SMA thin film deposited onto rough substrate provides higher adhesive strength than smooth substrate. However the roughness of the substrate has no influence on the growth and crystallization of the Ti-Ni SMA thin films.

  9. Toxicity assessment and selective leaching characteristics of Cu-Al-Ni shape memory alloys in biomaterials applications.

    Science.gov (United States)

    Chang, Shih-Hang; Chen, Bor-Yann; Lin, Jin-Xiang

    2016-04-06

    Cu-Al-Ni shape memory alloys (SMAs) possess two-way shape memory effects, superelasticity, and damping capacity. Nonetheless, Cu-Al-Ni SMAs remain promising candidates for use in biomedical applications, as they are more economical and machinable than other SMAs. Ensuring the biocompatibility of Cu-Al-Ni SMAs is crucial to their development for biomedical applications. Therefore, this study aimed to assess the toxicity of Cu-Al-Ni SMAs using a Probit dose-response model and augmented simplex design. In this study, the effects of Cu2+, Al3+ and Ni2+ metal ions on bacteria (Escherichia coli DH5α) using Probit dose-response analysis and augmented simplex design to assess the actual toxicity of the Cu-Al-Ni SMAs. Extraction and repetition of Escherichia coli DH5α solutions with high Cu2+ ion concentrations and 30-hour incubation demonstrated that Escherichia coli DH5α was able to alter its growth mechanisms in response to toxins. Metal ions leached from Cu-Al-Ni SMAs appeared in a multitude of compositions with varying degrees of toxicity, and those appearing close to a saddle region identified in the contour plot of the augmented simplex model were identified as candidates for elevated toxicity levels. When the Cu-13.5Al-4Ni SMA plate was immersed in Ringer's solution, the selective leaching rate of Ni2+ ions far exceeded that of Cu2+ and Al3+. The number of Cu2+, Al3+ and Ni2+ ions leached from Cu-Al-Ni SMAs increased with immersion time; however, at higher ratios, toxicity interactions among the metal ions had the effect of gradually reducing overall toxicity levels with regard to Escherichia coli DH5α. The quantities of Cu2+, Al3+ and Ni2+ ions leached from the Cu-13.5Al-4Ni SMA plate increased with immersion time, the toxicity interactions associated with these compositions reduced the actual toxicity to Escherichia coli DH5α.

  10. Wide bandgap engineering of (AlGa)2O3 films

    International Nuclear Information System (INIS)

    Zhang, Fabi; Saito, Katsuhiko; Tanaka, Tooru; Nishio, Mitsuhiro; Guo, Qixin; Arita, Makoto

    2014-01-01

    Bandgap tunable (AlGa) 2 O 3 films were deposited on sapphire substrates by pulsed laser deposition (PLD). The deposited films are of high transmittance as measured by spectrophotometer. The Al content in films is almost the same as that in targets. The measurement of bandgap energies by examining the onset of inelastic energy loss in core-level atomic spectra using X-ray photoelectron spectroscopy is proved to be valid for determining the bandgap of (AlGa) 2 O 3 films as it is in good agreement with the bandgap values from transmittance spectra. The measured bandgap of (AlGa) 2 O 3 films increases continuously with the Al content covering the whole Al content range from about 5 to 7 eV, indicating PLD is a promising growth technology for growing bandgap tunable (AlGa) 2 O 3 films.

  11. Corrosion behavior of nanostructured Ni-Si{sub 3}N{sub 4} composite films: A study of electrochemical impedance spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Li, J.M.; Cai, C.; Xue, M.Z.; Liu, Y.G. [School of Chemistry and Chemical Technology, Shanghai Jiao Tong University, Shanghai (China); Yin, J.Y.; Zhang, Z. [Department of Chemistry, Zhejiang University, Hangzhou (China); Key Laboratory for Light Alloy Materials Technology, JiaXing (China); Li, J.F. [School of Materials Science and Engineering, Central South University, Changsha (China); Yang, J.F. [State Key Laboratory for Mechanical Behavior of Materials, Xi' an Jiaotong University (China)

    2012-07-15

    Ni-Si{sub 3}N{sub 4} nanocomposite films with both the consecutive Ni crystallites and dispersed Si{sub 3}N{sub 4} particles in the nanometer range have been fabricated using DC electroplating technique, and characterized by scanning electron microscopy (SEM), transmission electron microscope (TEM), and X-ray diffraction (XRD). The corrosion resistance of the Ni-Si{sub 3}N{sub 4} nanocomposite film has been compared to that of pure Ni coating through polarization. Meanwhile, the corrosion process of Ni-Si{sub 3}N{sub 4} nanocomposite film in neutral 3.5% NaCl solution has been investigated using electrochemical impedance spectroscopy (EIS). The results show that the Ni-Si{sub 3}N{sub 4} nanocomposite film is more resistant to corrosion than the pure Ni coating. The corrosion of Ni-Si{sub 3}N{sub 4} nanocomposite film is controlled by electrochemical step, and the whole corrosion process is divided into two sequential stages. The main corrosion type of Ni-Si{sub 3}N{sub 4} nanocomposite films in neutral 3.5% NaCl solution is pitting. (Copyright copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  12. Corrosion Behavior of High Pressure Die Cast Al-Ni and Al-Ni-Ca Alloys in 3.5% NaCl Solution

    Energy Technology Data Exchange (ETDEWEB)

    Arthanari, Srinivasan; Jang, Jae Cheol; Shin, Kwang Seon [Seoul National University, Seoul (Korea, Republic of)

    2017-06-15

    In this investigation corrosion behavior of newly developed high-pressure die cast Al-Ni (N15) and Al-Ni-Ca (NX1503) alloys was studied in 3.5% NaCl solution. The electrochemical corrosion behavior was evaluated using open circuit potential (OCP) measurement, potentiodynamic polarization, and electrochemical impedance spectroscopy (EIS) techniques. Potentiodynamic polarization results validated that NX1503 alloy exhibited lower corrosion current density (i{sub corr}) value (5.969 μA/cm{sup 2}) compared to N15 (7.387 μA/cm{sup 2}). EIS-Bode plots revealed a higher impedance (|Z|) value and maximum phase angle value for NX1503 than N15 alloy. Equivalent circuit curve fitting analysis revealed that surface layer (R{sub 1}) and charge transfer resistance (R{sub ct}) values of NX1503 alloy was higher compared to N15 alloy. Immersion corrosion studies were also conducted for alloys using fishing line specimen arrangement to simultaneously measure corrosion rates from weight loss (P{sub W}) and hydrogen volume (P{sub H}) after 72 hours and NX1503 alloy had lower corrosion rate compared to N15 alloy. The addition of Ca to N15 alloy significantly reduced the Al{sub 3}Ni intermetallic phase and further grain refinement may be attributed for reduction in the corrosion rate.

  13. The kinetics of Cr layer coated on TiNi films for hydrogen absorption

    Indian Academy of Sciences (India)

    The effect of hydrogen absorption on electrical resistance with temperature for TiNi and TiNi–Cr thin films was investigated. The TiNi thin films of thickness 800 Å were deposited at different angles ( = 0°, 30°, 45°, 60° and 75°) under 10−5 Torr pressure by thermal evaporation on the glass substrate at room temperature.

  14. Energies of Electronic States of Ni (II) Ion in NiO-Al2O3 Catalyst Prepared by Impregnation

    International Nuclear Information System (INIS)

    Obadovic, D. Z.; Kiurski, J.; Marinkovic-Neducin, R. P.

    2007-01-01

    The behavior of NiO-Al2O3 catalysts is strongly dependent on the preparation method, as well as on pretreatment conditions. In the present work we investigated the influences of Ni(II) ion on NiO-Al2O3 catalysts properties due to the preparation by impregnation method. Based on experimental diffuse reflectance spectroscopy (DRS) data of electronic d-d transitions of Ni (II) promoter ion the energies of electronic states in spinel-like structure were calculated, and the most probable scheme of molecular orbital have been proposed

  15. The effect of hydrogen absorption on the electrical resistivities of SmCo5 and LaNi5 films

    International Nuclear Information System (INIS)

    Sakaguchi, H.; Nagai, H.; Adachi, G.; Shiokawa, J.

    1985-01-01

    Many studies have been carried out to clarify the absorption mechanism of hydrogen with a bulk of hexagonal CaCu 5 -type intermetallic compounds, such as LaNi 5 . The studies on films, however, have been scarcely carried out because of the difficulty in preparing an intermetallic compound film owing to the difference in the vapour pressure of the component metals. Some homogeneous LaNi 5 films were obtained by the authors using the technique of flash evaporation. Then it was found that they do not pulverize during the hydrogen absorption-desorption cycle. Therefore, it has been possible to measure the electrical resistivity using such films. The objects of our study were to reveal the mechanism of hydrogen absorption through the electrical property, and to apply the film to the functional materials, for instance, a hydrogen separation film. The hydrogen separation was attempted by the authors using the LaNi 5 film. A SmCo 5 film was a suitable candidate because the mass of hydrogen contained in this film should be smaller than that in the LaNi 5 film. In this paper we present a study on the properties of SmCo 5 films under a hydrogen atmosphere, as well as on LaNi 5 films. (author)

  16. Effect of Fe, Ni, and Cr on the corrosion behaviour of hyper-eutectic Al-Si automotive alloy under different pH conditions

    Directory of Open Access Journals (Sweden)

    Mohammad Salim Kaiser

    2018-05-01

    Full Text Available Effect of Fe, Ni and Cr on the corrosion behaviour of hyper-eutectic Al-Si automotive alloy was studied. The test of corrosion behaviour at different environmental pH 1, 3, 5, 7, 9, 11 and 13 was performed using conventional gravimetric measurements and complemented by resistivity, optical micrograph, scanning electron microscopy (SEM and X-ray analyser (EDX investigations. The highest corrosion rate was observed at pH 13 followed by pH 1, while in the pH range of 3.0 to 11, there is a high protection of surface due to formation of stable surface oxide film. The highest corrosion rate at pH 13 is due to presence of sodium hydroxide in the solution in which the surface oxide film is soluble. At pH 1, however, high corrosion rate can be attributed to dissolution of Al due to the surface attack by aggressive chloride ions. Presence of Fe, Ni and Cr in hyper-eutectic Al-Si automotive alloy has significant effect on the corrosion rate at both environmental pH values. Resistivity of alloy surfaces initially decreases at pH 1 and pH 13 due to formation of thin films. The SEM images of corroded samples immersed in pH 1 solution clearly show pores due to uniform degradation of the alloy. In pH 13 solution, however, the corrosion layer looks more packed and impermeable.

  17. Ni-Al phase transformation of dual layer coating prepared by pack cementation and electrodeposition

    Science.gov (United States)

    Afandi, A.; Sugiarti, E.; Ekaputra, R.; Sudiro, T.; Thosin, K. A. Z.

    2018-03-01

    In this work, Fe-Cr alloys were coated via Aluminum (Al) pack cementation, followed by Nickel (Ni) electrodeposition. The process of pack cementation was done with mixing powders of Al, Al203 and NH4Cl with weight percentage of 15%, 85%, and 5% respectively. To control successful Al diffusion to the substrate, pack cementation was conducted for 7 hours with two holding temperatures treatment at 400 °C for 4 hours, and 800 ° C hours for 2 hours. Subsequently, the electrodeposition of Ni was applied with the solution consisting of NiSO4, H3BO3, and NiCl2. The samples were placed in the cathode, and then dipped in the solutions, while Ni plate used as anode. Successfully the samples were coated by dual Al-Ni layers, the samples were slowly heat treated at 900 °C for 10 hours. The inter-diffusion of Al and Ni were characterized with SEM/EDX to investigate the distribution of the elements. Mechanical properties of the coated substrates were analyzed with Hardness Vickers (HV). It was found the hardness of the substrate increased significantly, from originally 255 HV to the 1177 HV after pack cementation. The hardness of the substrates has decreased to 641 HV after Ni plating, but subsequent heat treatment has been able to increase the hardness to 842 HV. This phenomenon can be correlated to the inward Al diffusion, and outward Fe, Cr diffusion. The formation of intermetallic compounds due to Al inward and Fe, Cr outward diffusion were discussed in details.

  18. Room temperature ferromagnetism in undoped and Ni doped In{sub 2}O{sub 3} thin films

    Energy Technology Data Exchange (ETDEWEB)

    Krishna, N. Sai; Kaleemulla, S., E-mail: skaleemulla@gmail.com; Rao, N. Madhusudhana; Krishnamoorthi, C.; Begam, M. Rigana [Thin Films Laboratory, School of Advanced Sciences, VIT University, Vellore – 632014 (India); Amarendra, G. [Materials Science Group, Indira Gandhi Centre for Atomic Research, Kalpakkam – 603102 (India); UGC-DAE-CSR, Kalpakkam Node, Kokilamedu-603104 (India)

    2015-06-24

    Undoped and Ni (5 at.%) doped In{sub 2}O{sub 3} thin films were deposited on glass substrate using electron beam evaporation technique and Ni doped In{sub 2}O{sub 3} thin films were annealed at 450 oC. A systematic study was carried out on the structural, chemical and magnetic properties of the as deposited and annealed thin films. X-ray diffraction analysis revealed that all the films were cubic in structure and exhibied ferromagnetism at room temperature. The undoped In{sub 2}O{sub 3} thin films exhibited a saturation magnetization of 24.01 emu/cm3. Ni doped In{sub 2}O{sub 3} thin films annealed at 450 oC showed a saturation magnetization of 53.81 emu/cm3.

  19. Effect of tungsten (W) on structural and magnetic properties of electroplated NiFe thin films for MEMS applications

    Science.gov (United States)

    Kannan, R.; Devaki, P.; Premkumar, P. S.; Selvambikai, M.

    2018-04-01

    Electrodeposition of nanocrystalline NiFe and NiFeW thin films were carried out from ammonium citrate bath at a constant current density and controlled pH of 8 by varying the bath temperature from 40 °C to 70 °C. The surface morphology and chemical composition of the electrodeposited NiFe and NiFeW soft magnetic thin films were studied by using SEM and EDAX. The SEM micrographs of the films coated at higher electrodeposited bath temperature have no micro cracks and also the films have more uniform surface morphology. The existence of crystalline nature of the coated films were analysed by XRD. The presence of predominant peaks in x-ray diffraction pattern (compared with JCPDS data) reveal that the average crystalline size was in the order of few tens of nano meters. The magnetic properties such as coercivity, saturation magnetization and magnetic flux density have been calculated from vibrating sample magnetometer analysis. The VSM result shows that the NiFeW thin film synthesised at 70 °C exhibit the lower coercivity with higher saturation magnetization. The hardness and adhesion of the electroplated films have been investigated. Reasons for variation in magnetic properties and structural characteristics are also discussed. The electroplated NiFe and NiFeW thin films can be used for Micro Electro Mechanical System (MEMS) applications due to their excellent soft magnetic behaviour.

  20. The formation mechanism of eutectic microstructures in NiAl-Cr composites.

    Science.gov (United States)

    Tang, Bin; Cogswell, Daniel A; Xu, Guanglong; Milenkovic, Srdjan; Cui, Yuwen

    2016-07-20

    NiAl-based eutectic alloys, consisting of an ordered bcc matrix (B2) and disordered bcc fibers (A2), have been a subject of intensive efforts aimed at tailoring the properties of many of the currently used nickel-based superalloys. A thermodynamic phase field model was developed on a thermodynamic foundation and fully integrated with a thermo-kinetic database of the Ni-Al-Cr ternary system to elucidate the resulting peculiar eutectic microstructure. Invoking a variation of the liquid/solid interfacial thickness with temperature, we simulated the characteristic sunflower-like eutectic microstructures in the NiAl-Cr composites, consistent with experimental observations. The mechanism that governs the formation of the peculiar eutectic morphology was envisioned from the modeled evolutions associated with six sequential steps. Our calculations show that the conditional spinodal decomposition occurring in sequence could further trim and revise the microstructure of the eutectics by generating fine-domain structures, thereby providing an additional method to explore the novel NiAl-based eutectic composites with tunable properties at elevated temperatures.

  1. Phase evolution in Al-Ni-(Ti, Nb, Zr) powder blends by mechanical alloying

    Energy Technology Data Exchange (ETDEWEB)

    Samanta, A. [Department of Metallurgy and Materials Engineering, Bengal Engineering and Science University, Shibpur (India); Manna, I. [Metallurgical and Materials Engineering Department, I.I.T., Kharagpur 721302 (India); Chattopadhyay, P.P. [Department of Metallurgy and Materials Engineering, Bengal Engineering and Science University, Shibpur (India)], E-mail: c.partha@mailcity.com

    2007-08-25

    Mechanical alloying of Al-rich Al-Ni-ETM (ETM = Ti, Nb, Zr) elemental powder blends by planetary ball milling yielded amorphous and/or nanocrystalline products after ball milling for suitable duration. Powder samples collected at different stages of ball milling have been examined by X-ray diffraction, differential scanning caloremetry and high-resolution transmission electron microscopy to examine the solid-state phase evolution. Powder blends having nominal composition of Al{sub 80}Ni{sub 10}Ti{sub 10} and Al{sub 80}Ni{sub 10}Nb{sub 10} yielded predominantly amorphous products, while the other alloys formed composite microstructures comprising nanaocrystalline and amorphous solid solutions. The amorphous Al{sub 80}Ni{sub 10}Ti{sub 10} alloy was mixed with different amounts of Al powder, and subjected to warm rolling after consolidation within the Al-cans with or without intermediate annealing for 10 min at 500 K to obtain sheet of 2.5 mm thickness. Notable improvement in mechanical properties has been achieved for the composite sheets in comparison to the pure Al.

  2. A study on the electrodeposition of NiFe alloy thin films using chronocoulometry and electrochemical quartz crystal microgravimetry

    CERN Document Server

    Myung, N S

    2001-01-01

    Ni, Fe and NiFe alloy thin films were electrodeposited at a polycrystalline Au surface using a range of electrolytes and potentials. Coulometry and EQCM were used for real-time monitoring of electroplating efficiency of the Ni and Fe. The plating efficiency of NiFe alloy thin films was computed with the aid of ICP spectrometry. In general, plating efficiency increased to a steady value with deposition time. Plating efficiency of Fe was lower than that of Ni at -0.85 and -1.0 V but the efficiency approached to the similar plateau value to that of Ni at more negative potentials. The films with higher content of Fe showed different stripping behavior from the ones with higher content of Ni. Finally, compositional data and real-time plating efficiency are presented for films electrodeposited using a range of electrolytes and potentials.

  3. Novel Chiral Magnetic Domain Wall Structure in Fe/Ni/Cu(001) Films

    Science.gov (United States)

    Chen, G.; Zhu, J.; Quesada, A.; Li, J.; N'Diaye, A. T.; Huo, Y.; Ma, T. P.; Chen, Y.; Kwon, H. Y.; Won, C.; Qiu, Z. Q.; Schmid, A. K.; Wu, Y. Z.

    2013-04-01

    Using spin-polarized low energy electron microscopy, we discovered a new type of domain wall structure in perpendicularly magnetized Fe/Ni bilayers grown epitaxially on Cu(100). Specifically, we observed unexpected Néel-type walls with fixed chirality in the magnetic stripe phase. Furthermore, we find that the chirality of the domain walls is determined by the film growth order with the chirality being right handed in Fe/Ni bilayers and left handed in Ni/Fe bilayers, suggesting that the underlying mechanism is the Dzyaloshinskii-Moriya interaction at the film interfaces. Our observations may open a new route to control chiral spin structures using interfacial engineering in transition metal heterostructures.

  4. Microstructural Evolution of NiCoCrAlHfYSi and NiCoCrAlTaY Coatings Deposited by AC-HVAF and APS

    Science.gov (United States)

    Han, Yujun; Chen, Hongfei; Gao, Dong; Yang, Guang; Liu, Bin; Chu, Yajie; Fan, Jinkai; Gao, Yanfeng

    2017-12-01

    The chemical composition of NiCoCrAlHfYSi with a suitable particle size, deposited using an activated combustion-high velocity air fuel (AC-HVAF) spray, is a potentially promising process because dense, continuous and pure alumina can be formed on the surface of the MCrAlY metallic coatings after isothermal oxidation exposure. The NiCoCrAlHfYSi (Amdry386) and NiCoCrAlTaY (Amdry997) coatings were produced using AC-HVAF and APS, respectively. Isothermal oxidation was subsequently conducted at 1050 °C in air for 200 h. This paper compares the characteristics of four coated samples, including the surface roughness, elastic modulus, hardness, oxide content, microstructural characteristics and phase evolution of thermally grown oxides (TGO). The growth of both the TGO and alumina scales in the TGO of the HVAF386 coating was relatively rapid. The θ- to α-alumina phase transformation was strongly determined by the Hf and Si dopants in the HVAF386 coating. Finally, the extent of grain refinement and deformation storage energy in the HVAF997 coatings were determined to be significantly crucial for the θ- to α-alumina phase transformation.

  5. Effect of Ni on eutectic structural evolution in hypereutectic Al-Mg2Si cast alloys

    International Nuclear Information System (INIS)

    Li Chong; Wu Yaping; Li Hui; Wu Yuying; Liu Xiangfa

    2010-01-01

    Research highlights: → By the injection of rod-like NiAl 3 phase in Al-Mg 2 Si alloys, Al-Mg 2 Si binary eutectic structure gradually evolves into Al-Mg 2 Si-NiAl 3 ternary eutectic. → The ternary eutectic presents a unique double rod structure that rod-like NiAl 3 and Mg 2 Si uniformly distribute in Al matrix. → The mechanism of structural evolution was analyzed in terms of the detailed microstructural observations. → The high temperature (350 deg. C) tensile strength of the alloy increases by 23% due to the eutectic structural evolution. - Abstract: The aim of this work is to investigate the eutectic structural evolution of hypereutectic Al-20% Mg 2 Si with Ni addition under a gravity casting process. Three-dimensional morphologies of eutectic phases were observed in detail using field emission scanning electron microscopy, after Al matrix was removed by deep etching or extraction. The results show that Al-Mg 2 Si binary eutectic gradually evolves into Al-Mg 2 Si-NiAl 3 ternary eutectic with the increase of Ni content, and flake-like eutectic Mg 2 Si transforms into rods. The ternary eutectic presents a unique double rod structure that rod-like NiAl 3 and Mg 2 Si uniformly distribute in Al matrix. Further, the high temperature (350 deg. C) tensile strength of the alloy increases by 23% due to the eutectic structure evolution, and the mechanism of structural evolution was discussed and analyzed in terms of the detailed microstructural observations.

  6. Interfacial, mechanical properties of Al{sub 2}O{sub 3}-NiAl composites respective to long term thermal stability

    Energy Technology Data Exchange (ETDEWEB)

    Song, Jia; Hu, Weiping; Gottstein, Guenter [RWTH Aachen Univ. (Germany). Inst. of Physical Metallurgy and Metal Physics

    2010-07-01

    The long term thermal stability of NiAl-Al{sub 2}O{sub 3} composites was investigated. During annealing of the composites at 973 K and 1373 K for 2000 hours, the NiAl-Al{sub 2}O{sub 3} system showed excellent chemical stability. However, grain growth and embrittlement progressed in the polycrystalline NiAl matrix. The interfacial shear strength decreased from 222{+-}50 MPa for the as-fabricated sample to 197{+-}48 MPa and 150{+-}38 MPa for the samples annealed at 973 K and 1373 K, respectively. The microstructure change during annealing at 973K and 1373 K affected the tensile strength differently. The potential causes of microstructure and interface structure change and their impact on mechanical properties are discussed. (orig.)

  7. Epitactical FeAl films on sapphire and their magnetic properties; Epitaktische FeAl-Filme auf Saphir und ihre magnetischen Eigenschaften

    Energy Technology Data Exchange (ETDEWEB)

    Trautvetter, Moritz

    2011-05-05

    In the presented thesis epitaxial FeAl thin films on sapphire have been prepared by pulse laser deposition (PLD). The thin films deposited at room temperature exhibits ferromagnetism and subsequent annealing is necessary to transform the thin films to paramagnetic B2-phase, where the transition temperature depends on the crystalline orientation of the sapphire substrate. Alternatively, by deposition at higher substrate temperature the B2-phase is obtained directly. However, morphology of the FeAl film is influenced by different growth modes resulting from different substrate temperatures. The paramagnetic FeAl films can then be transformed to ferromagnetic phase by successive ion irradiation. Independent of the ion species used for irradiation, the same universal relation between thin films' coercive fields and irradiation damage is identified. The ion irradiation ferromagnetism can be transformed back to paramagnetism by subsequent annealing. The mutual transition between ferromagnetic and paramagnetic phases has been performed several times and shows full reversibility. The ferromagnetic phase induced by Kr{sup +} irradiation exhibits structural relaxation, where the saturate magnetization of FeAl thin film gradually decreases in several days. Later, ion irradiation has been performed selectively on defined areas of the thin film with the help of an unconventional lithography technique. The subsequent thin film is composed of ordered hexagonal array of ferromagnetic nano-cylinders separated by a paramagnetic matrix, suggesting a promising system for magnetic data storage. (orig.)

  8. The Al-rich region of the Al-Mn-Ni alloy system. Part II. Phase equilibria at 620-1000 oC

    International Nuclear Information System (INIS)

    Balanetskyy, S.; Meisterernst, G.; Grushko, B.; Feuerbacher, M.

    2011-01-01

    Research highlights: → Phase equilibria in the Al-rich region of the Al-Mn-Ni alloy system were studied at 1000, 950, 850, 750, 700, 645 and 620 deg. C by means of SEM, TEM, powder XRD and DTA. → Three ternary thermodynamically stable intermetallics, the φ-phase (Al 5 Co 2 -type, hP26, P63/mmc; a = 0.76632(16), c = 0.78296(15) nm), the κ-phase (κ-Al 14.4 Cr 3.4 Ni l.1 -type, hP227, P63/m; a = 1.7625(10), c = 1.2516(10) nm), and the O-phase (O-Al 77 Cr 14 Pd 9 -type, Pmmn, oP650,: a = 2.3316(16), b = 1.2424(15), c = 3.2648(14) nm), as well as three ternary metastable phases, the decagonal D 3 -phase with periodicity about 1.25 nm, the Al 9 (Mn,Ni) 2 -phase (Al 9 Co 2 -type, P1121/a, mP22; a = 0.8585(16), b = 0.6269(9), c = 0.6205(11) nm, β = 95.34(10) o ) and the O 1 -phase (basecentered orthorhombic, a ∼ 23.8, b ∼ 12.4, c ∼ 32.2 nm) were revealed. → The existence of a thermodynamically stable R-phase of stoichiometry Al 60 Mn 11 Ni 4 , reported earlier in literature, was not confirmed in the present study. - Abstract: Phase equilibria in the Al-rich region of the Al-Mn-Ni alloy system were studied at 1000, 950, 850, 750, 700, 645 and 620 o C. Three ternary thermodynamically stable intermetallics, the φ-phase (Al 5 Co 2 -type, hP26, P6 3 /mmc; a = 0.76632(16), c = 0.78296(15) nm), the κ-phase (κ-Al 14.4 Cr 3.4 Ni l.1 -type, hP227, P6 3 /m; a = 1.7625(10), c = 1.2516(10) nm), and the O-phase (O-Al 77 Cr 14 Pd 9 -type, Pmmn, oP650,: a = 2.3316(16), b = 1.2424(15), c = 3.2648(14) nm), as well as three ternary metastable phases, the decagonal D 3 -phase with periodicity about 1.25 nm, the Al 9 (Mn,Ni) 2 -phase (Al 9 Co 2 -type, P112 1 /a, mP22; a = 0.8585(16), b = 0.6269(9), c = 0.6205(11) nm, β = 95.34(10) o ) and the O 1 -phase (base-centered orthorhombic, a ∼ 23.8, b ∼ 12.4, c ∼ 32.2 nm) were revealed. Their physicochemical behaviour in the Al-Mn-Ni alloy system was studied.

  9. Preparation of p-type NiO films by reactive sputtering and their application to CdTe solar cells

    Science.gov (United States)

    Ishikawa, Ryousuke; Furuya, Yasuaki; Araki, Ryouichi; Nomoto, Takahiro; Ogawa, Yohei; Hosono, Aikyo; Okamoto, Tamotsu; Tsuboi, Nozomu

    2016-02-01

    Transparent p-type NiO films were prepared by reactive sputtering using the facing-target system under Ar-diluted O2 gas at Tsub of 30 and 200 °C. The increasing intensity of dominant X-ray diffraction (XRD) peaks indicates improvements in the crystallinity of NiO films upon Cu doping. In spite of the crystallographic and optical changes after Cu-doping, the electrical properties of Cu-doped NiO films were slightly improved. Upon Ag-doping at 30 °C under low O2 concentration, on the other hand, the intensity of the dominant (111) XRD peaks was suppressed and p-type conductivity increased from ˜10-3 to ˜10-1 S cm-1. Finally, our Ag-doped NiO films were applied as the back contact of CdTe solar cells. CdTe solar cells with a glass/ITO/CdS/CdTe/NiO structure exhibited an efficiency of 6.4%, suggesting the high potential of using p-type NiO for the back-contact film in thin-film solar cells.

  10. High-resolution electron microscopy study of Ni81Fe19 film with Co33Cr67 buffer layer

    International Nuclear Information System (INIS)

    Xu, Q.Y.; Wang, Z.M.; Shen, F.; Du, Y.W.; Zhang, Z.

    2003-01-01

    The anisotropic magnetoresistance (AMR) in permalloy Ni 81 Fe 19 film deposited on a 1.2 nm Co 33 Cr 67 buffer layer was significantly enhanced. The high-resolution electron microscopy was used to study the microstructure of Ni 81 Fe 19 film with and without Co 33 Cr 67 buffer layer. It was found that Co 33 Cr 67 buffer layer can induce good (1 1 1) texture, while without Co 33 Cr 67 buffer layer, Ni 81 Fe 19 film show randomly oriented grain structure. The Δρ/ρ enhancement is attributed to the decrease in the resistivity ρ of the Ni 81 Fe 19 film due to the formation of the large (1 1 1) textured grains in Ni 81 Fe 19 film with Co 33 Cr 67 buffer layer. However, the surface roughness of substrate may limit the (1 1 1) textured grain size and induce additional grain boundaries in Ni 81 Fe 19 film with Co 33 Cr 67 buffer layer, limit the enhancement of the AMR effect

  11. Magnetism, microstructure and First Principles calculations of atomized and annealed Ni3Al

    International Nuclear Information System (INIS)

    García-Escorial, A.; Crespo, P.; Hernando, A.; Lieblich, M.; Marín, P.; Velasco, V.; Ynduráin, F.

    2014-01-01

    Highlights: • The microstructure and order of as-atomized Ni 3 Al powder change with annealing. • The change of the magnetic properties shows the influence of the chemical order. • First Principles calculations show the effect of the density of states to the order. - Abstract: In this work Ni 3 Al powder particles obtained by atomization were characterized magnetically and microstructurally in as-atomized state and after annealing. Upon annealing the X-ray diffraction patterns show a noticeable increase of the signal of the ordered phase γ′-Ni 3 Al, L1 2 , phase and the microstructure evolves from a lamellar and dendrite to a large grain microstructure. The Curie temperature of the as-atomized powder particles is 85 K and decreases after annealing down to 50 K. First Principles calculations were carried out to correlate the experimental observations with local order of Ni and Al atoms and illustrate the importance of the local order in the density of states at the Fermi level, showing how the magnetic moment depends on the Ni and Al atomic position

  12. Improved conductivity of infinite-layer LaNiO{sub 2} thin films by metal organic decomposition

    Energy Technology Data Exchange (ETDEWEB)

    Ikeda, Ai [Department of Applied Physics, Tokyo University of Agriculture and Technology, Naka-cho 2-24-16, Koganei, Tokyo 184-8588 (Japan); Research Fellow of the Japan Society for the Promotion of Science (Japan); Manabe, Takaaki [National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba, Ibaraki 305-8565 (Japan); Naito, Michio, E-mail: minaito@cc.tuat.ac.jp [Department of Applied Physics, Tokyo University of Agriculture and Technology, Naka-cho 2-24-16, Koganei, Tokyo 184-8588 (Japan)

    2013-12-15

    Highlights: •LaNiO{sub 2} films were synthesized by metal organic decomposition and topotactic reduction. •Room-temperature resistivity as low as 0.6 mΩ cm was achieved for infinite-layer LaNiO{sub 2}. •Lattice matched substrates are important in obtaining high conductivity. -- Abstract: Infinite-layer LaNiO{sub 2} thin films were synthesized by metal organic decomposition and subsequent topotactic reduction in hydrogen, and their transport properties were investigated. LaNiO{sub 2} is isostructural to SrCuO{sub 2}, the parent compound of high-T{sub c} Sr{sub 0.9}La{sub 0.1}CuO{sub 2} with T{sub c} = 44 K, and has 3d{sup 9} configuration, which is very rare in oxides but common to high-T{sub c} copper oxides. The bulk synthesis of LaNiO{sub 2} is not easy, but we demonstrate in this article that the thin-film synthesis of LaNiO{sub 2} is rather easy, thanks to a large-surface-to-volume ratio, which makes oxygen diffusion prompt. Our refined synthesis conditions produced highly conducting films of LaNiO{sub 2}. The resistivity of the best film is as low as 640 μΩ cm at 295 K and decreases with temperature down to 230 K but it shows a gradual upturn at lower temperatures.

  13. Layered Ni(OH)2-Co(OH)2 films prepared by electrodeposition as charge storage electrodes for hybrid supercapacitors.

    Science.gov (United States)

    Nguyen, Tuyen; Boudard, Michel; Carmezim, M João; Montemor, M Fátima

    2017-01-04

    Consecutive layers of Ni(OH) 2 and Co(OH) 2 were electrodeposited on stainless steel current collectors for preparing charge storage electrodes of high specific capacity with potential application in hybrid supercapacitors. Different electrodes were prepared consisting on films of Ni(OH) 2 , Co(OH) 2 , Ni 1/2 Co 1/2 (OH) 2 and layered films of Ni(OH) 2 on Co(OH) 2 and Co(OH) 2 on Ni(OH) 2 to highlight the advantages of the new architecture. The microscopy studies revealed the formation of nanosheets in the Co(OH) 2 films and of particles agglomerates in the Ni(OH) 2 films. Important morphological changes were observed in the double hydroxides films and layered films. Film growth by electrodeposition was governed by instantaneous nucleation mechanism. The new architecture composed of Ni(OH) 2 on Co(OH) 2 displayed a redox response characterized by the presence of two peaks in the cyclic voltammograms, arising from redox reactions of the metallic species present in the layered film. These electrodes revealed a specific capacity of 762 C g -1 at the specific current of 1 A g -1 . The hybrid cell using Ni(OH) 2 on Co(OH) 2 as positive electrode and carbon nanofoam paper as negative electrode display specific energies of 101.3 W h g -1 and 37.8 W h g -1 at specific powers of 0.2 W g -1 and 2.45 W g -1 , respectively.

  14. Capability of Sputtered Micro-patterned NiTi Thick Films

    Science.gov (United States)

    Bechtold, Christoph; Lima de Miranda, Rodrigo; Quandt, Eckhard

    2015-09-01

    Today, most NiTi devices are manufactured by a combination of conventional metal fabrication steps, e.g., melting, extrusion, cold working, etc., and are subsequently structured by high accuracy laser cutting. This combination has been proven to be very successful; however, there are several limitations to this fabrication route, e.g., in respect to the fabrication of more complex device designs, device miniaturization or the combination of different materials for the integration of further functionality. These issues have to be addressed in order to develop new devices and applications. The fabrication of micro-patterned films using magnetron sputtering, UV lithography, and wet etching has great potential to overcome limitations of conventional device manufacturing. Due to its fabrication characteristics, this method allows the production of devices with complex designs, high structural accuracy, smooth edge profile, at layer thicknesses up to 75 µm. The aim of this study is to present recent developments in the field of NiTi thin film technology, its advantages and limitations, as well as new possible applications in the medical and in non-medical fields. These developments include among others NiTi scaffold structures covered with NiTi membranes for their potential use as filters, heart valve components or aneurysm treatments, as well as micro-actuators for consumable electronics or automotive applications.

  15. Setting of an experimental simple technique for the realization of Ni2V2O7 thin films

    International Nuclear Information System (INIS)

    Baba, Ali E.; Bernede, J.C.; Zoaeter, M.

    1999-01-01

    Full text.Ni/V/Ni/V..../Ni/V/Ni thin layers were sequentially deposited in the atomic ratio Ni/V=1.Ni and V were deposited by an electron beam. The samples were annealed half an hour at 863K in room atmosphere. The films were characterized by x-ray diffraction, x-ray photoelectron spectroscopy (XPS), scanning electron microscopy and microprobe analysis. The results obtained, by comparison with those obtained on a reference powder, show that Ni 2 V 2 O 7 thin films crystallized in the monoclinic structure P21/c layer. Since SnO 2 is transparent conductive oxide this is very promising for the use of such oxides as negative electrode in thin film batteries

  16. Room temperature ferromagnetism in (In{sub 1-x}Ni{sub x}){sub 2}O{sub 3} thin films

    Energy Technology Data Exchange (ETDEWEB)

    Sai Krishna, N. [Thin Films Laboratory, School of Advanced Sciences, VIT University, Vellore 632014, Tamilnadu (India); Kaleemulla, S., E-mail: skaleemulla@gmail.com [Thin Films Laboratory, School of Advanced Sciences, VIT University, Vellore 632014, Tamilnadu (India); Amarendra, G. [Materials Science Group, Indira Gandhi Centre for Atomic Research, Kalpakkam 603102, Tamilnadu (India); UGC-DAE-CSR, Kalpakkam Node, Kokilamedu 603104,Tamilnadu (India); Madhusudhana Rao, N.; Krishnamoorthi, C.; Rigana Begam, M. [Thin Films Laboratory, School of Advanced Sciences, VIT University, Vellore 632014, Tamilnadu (India); Omkaram, I. [Department of Electronics and Radio Engineering, Kyung Hee University, Yongin-si, Gyeonggi-do 446-701 (Korea, Republic of); Sreekantha Reddy, D. [Department of Physics and Sungkyunkwan Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)

    2015-06-15

    Polycrystalline (In{sub 1−x}Ni{sub x}){sub 2}O{sub 3} thin films (x=0.00, 0.03, 0.05 and 0.07) were deposited on glass substrates by electron beam evaporation technique. The effect of Ni concentration on composition, structural and magnetic properties of (In{sub 1−x}Ni{sub x}){sub 2}O{sub 3} thin films was studied. Increment in the Ni concentration does increase the oxygen vacancies and ferromagnetic strength in (In{sub 1−x}Ni{sub x}){sub 2}O{sub 3} thin films. X-ray photoelectron spectroscopy (XPS) studies indicate the dopant Ni exists in Ni (II) state in In{sub 2}O{sub 3} host. Ferromagnetism was attributed to intrinsic nature of the sample rather than any secondary magnetic phases exist in the films. The observed ferromagnetism in (In{sub 1−x}Ni{sub x}){sub 2}O{sub 3} was attributed to ferromagnetic exchange interaction between Ni{sup 2+} ions via single free electron trapped in oxygen vacancy. Increase in oxygen vacancies with Ni concentration lead to increase in such an oxygen vacancy mediated ferromagnetic pairs resulting in increase in ferromagnetic strength with Ni concentration.

  17. Solid state dewetting and stress relaxation in a thin single crystalline Ni film on sapphire

    International Nuclear Information System (INIS)

    Rabkin, E.; Amram, D.; Alster, E.

    2014-01-01

    In this study, we deposited a 80 nm thick single crystalline Ni film on a sapphire substrate. Heat treatment of this film at 1000 °C followed by slow cooling resulted in the formation of faceted holes, star-like channel instabilities and faceted microwires. The ridges at the rims of faceted holes and channels exhibited a twinning orientation relationship with the rest of the film. A sub-nanometer-high hexagonal topography pattern on the surface of the unperturbed film was observed by atomic force microscopy. No such pattern was observed on the top facets of isolated Ni particles and hole ridges. We discuss the observed dewetting patterns in terms of the effects of Ni surface anisotropy and faceting on solid state dewetting. The hexagonal pattern on the surface of the unperturbed film was attributed to thermal stress relaxation in the film via dislocations glide. This work demonstrates that solid state dewetting of single crystalline metal films can be utilized for film patterning and for producing hierarchical surface topographies

  18. TiFeCoNi oxide thin film - A new composition with extremely low electrical resistivity at room temperature

    International Nuclear Information System (INIS)

    Yang, Ya-Chu; Tsau, Chun-Huei; Yeh, Jien-Wei

    2011-01-01

    We show the electrical resistivity of a TiFeCoNi oxide thin film. The electrical resistivity of the TiFeCoNi thin film decreased sharply after a suitable period of oxidation at high temperature. The lowest resistivity of the TiFeCoNi oxide film was 35 ± 3 μΩ-cm. The low electrical resistivity of the TiFeCoNi oxide thin film was attributed to Ti, which is more reactive than the other elements, reacting with oxygen at the initial stage of annealing. The low resistivity is caused by the remaining electrons.

  19. Preparation of hcp-Ni(112-bar 0) epitaxial thin films on Au(100) single-crystal underlayers

    International Nuclear Information System (INIS)

    Ohtake, Mitsuru; Tanaka, Takahiro; Futamoto, Masaaki; Kirino, Fumiyoshi

    2010-01-01

    Ni epitaxial films with an hcp structure are successfully obtained on Au(100) single-crystal underlayers formed on MgO(100) substrates at temperatures lower than 300 0 C by molecular beam epitaxy. With increasing the substrate temperature, the volume ratio of more stable fcc phase inc r eases in the film. The Ni film prepared at 100 0 C consists primarily of hcp crystal with the (112-bar 0) plane parallel to the substrate surface coexisting with a small amount of fcc-Ni(100) crystal. The lattice constant of hcp-Ni crystal is determined as a = 0.249 nm, c = 0.398 nm, and c/a = 1.60.

  20. Hydrogen Gas Sensing Characteristics of Nanostructured NiO Thin Films Synthesized by SILAR Method

    Science.gov (United States)

    Karaduman, Irmak; Çorlu, Tugba; Yıldırım, M. Ali; Ateş, Aytunç; Acar, Selim

    2017-07-01

    Nanostructured NiO thin films have been synthesized by a facile, low-cost successive ionic layer adsorption and reaction (SILAR) method, and the effects of the film thickness on their hydrogen gas sensing properties investigated. The samples were characterized by scanning electron microscopy (SEM), x-ray diffraction (XRD) analysis, and energy-dispersive x-ray analysis. The XRD results revealed that the crystallinity improved with increasing thickness, exhibiting polycrystalline structure. SEM studies showed that all the films covered the glass substrate well. According to optical absorption measurements, the optical bandgap decreased with increasing film thickness. The gas sensing properties of the nanostructured NiO thin films were studied as a function of operating temperature and gas concentration. The samples showed good sensing performance of H2 gas with high response. The maximum response was 75% at operating temperature of 200°C for hydrogen gas concentration of 40 ppm. These results demonstrate that nanostructured NiO thin films synthesized by the SILAR method have potential for application in hydrogen detection.

  1. Rapid thermal annealing of Ti-rich TiNi thin films: A new approach to fabricate patterned shape memory thin films

    International Nuclear Information System (INIS)

    Motemani, Y.; Tan, M.J.; White, T.J.; Huang, W.M.

    2011-01-01

    This paper reports the rapid thermal annealing (RTA) of Ti-rich TiNi thin films, synthesized by the co-sputtering of TiNi and Ti targets. Long-range order of aperiodic alloy could be achieved in a few seconds with the optimum temperature of 773 K. Longer annealing (773 K/240 s), transformed the film to a poorly ordered vitreous phase, suggesting a novel method for solid state amorphization. Reitveld refinement analyses showed significant differences in structural parameters of the films crystallized by rapid and conventional thermal annealing. Dependence of the elastic modulus on the valence electron density (VED) of the crystallized films was studied. It is suggested that RTA provides a new approach to fabricate patterned shape memory thin films.

  2. Order-disorder transformation in the Ni-4.49 at.% Al alloy

    International Nuclear Information System (INIS)

    Adorno, A.T.; Garlipp, W.; Cilense, M.; Silva, R.A.G.

    2006-01-01

    The order-disorder transformation in the Ni-4.49 at.% Al alloy was studied using electrical resistivity measurements, microhardness measurements, differential scanning calorimetry (DSC) and transmission electron microscopy (TEM). The results confirmed the ordering behavior expected for Ni-Al dilute alloys and the suggested relation between resistivity changes and microhardness changes with anti-ferromagnetic spin ordering. The higher value obtained for the activation energy of vacancy migration was associated with a decrease in the Al concentration gradient near solute-depleted regions

  3. Reactive resistance welding of Ti6Al4V alloy with the use of Ni(V)/Al multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Maj, Lukasz; Morgiel, Jerzy [Institute of Metallurgy and Materials Science, Polish Academy of Sciences, Krakow (Poland); Mars, Krzysztof; Godlewska, Elzbieta [Faculty of Materials Science and Ceramics, AGH University of Science and Technology, Krakow (Poland)

    2017-02-15

    The freestanding Ni(V)/Al multilayer foil was applied as a filler material in order to join Ti6Al4V alloy with the use of reactive resistance welding (RRW) technique. Present investigations, performed with the use of transmission electron microscopy (TEM) method, allowed to show that an application of high current (I = 400 A for 2 min in vacuum conditions ∝10{sup -1} mbar) transformed the Ni(V)/Al multilayers into fine grain (<300 nm) NiAl phase. It also showed that the RRW process led to the formation of firm connection with nanoporosity limited only to the original contact plane between base material and the foil. Simultaneously, the formation of a narrow strip of crystallites of Ti{sub 3}Al intermetallic phase elongated along the joint line (average size of ∝200 nm) was observed. The base material was separated from the joint area by a layer of up to ∝2 μm thickness of nearly defect free α-Ti and β-Ti grains from a heat affected zone (HAZ). The performed experiment proved that Ni(V)/Al multilayer could serve as a filler material for joining of Ti6Al4V alloys even without additional solder layer. (copyright 2016 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  4. Effect of oxygen plasma treatment on crystal growth mode at pentacene/Ni interface in organic thin-film transistors.

    Science.gov (United States)

    Song, Bang Joo; Hong, Kihyon; Kim, Woong-Kwon; Kim, Kisoo; Kim, Sungjun; Lee, Jong-Lam

    2010-11-25

    We report how treatment of nickel (Ni) with O(2) plasma affects the polarity of Ni surface, crystallinity of pentacene film on the Ni, and electrical properties of pentacene organic thin-film transistors (OTFTs) that use Ni as source-drain electrodes. The polar component of surface energy in Ni surface increased from 8.1 to 43.3 mJ/m(2) after O(2)-plasma treatment for 10 s. From X-ray photoelectron spectra and secondary electron emission spectra, we found that NiO(x) was formed on the O(2)-plasma-treated Ni surface and the work function of O(2)-plasma-treated Ni was 0.85 eV higher than that of untreated Ni. X-ray diffraction and atomic force microscopy measurements showed that pentacene molecules are well aligned as a thin-film and grains grow much larger on O(2)-plasma-treated Ni than on untreated Ni. This change in the growth mode is attributed to the reduction of interaction energy between pentacene and Ni due to formation of oxide at the Ni/pentacene interface. Thus, O(2)-plasma treatment promoted the growth of well-ordered pentacene film and lowered both the hole injection barrier and the contact resistance between Ni and pentacene by forming NiO(x), enhancing the electrical property of bottom-contact OTFTs.

  5. Strain-delocalizing effect of a metal substrate on nanocrystalline Ni film

    Energy Technology Data Exchange (ETDEWEB)

    Qi, Dexing [Department of Mechanical Engineering, Nanjing Tech University, Nanjing, Jiangsu Province 210009 (China); Zhou, Jianqiu, E-mail: zhouj@njut.edu.cn [Department of Mechanical Engineering, Nanjing Tech University, Nanjing, Jiangsu Province 210009 (China); Department of Mechanical Engineering, Wuhan Institute of Technology, Wuhan, Hubei Province 430070 (China); Liu, Hongxi; Dong, Shuhong [Department of Mechanical Engineering, Nanjing Tech University, Nanjing, Jiangsu Province 210009 (China); Wang, Ying [Department of Mechanical and Electronic Engineering, Suzhou Institute of Industrial Technology, Suzhou, Jiangsu 215104 (China)

    2015-07-29

    Uniaxial tensile test and scanning electron microscopy (SEM) are introduced to study the tensile properties of electrodeposited nanocrystalline nickel/coarse-grained copper (N/C) composite in this paper. Compared to the stress strain response of pure nanocrystalline (NC) nickel (Ni), the tensile ductility of N/C composite is enhanced significantly. Based on the experimental results, a multi-phase composite model is proposed to investigate the micromechanical behaviors of the NC Ni film and N/C composite plate. The constitutive models are implemented into ABAQUS/Explicit in the form of VUMAT subroutine. A series of numerical simulations are carried out and the predications were in good agreement with experimental results. It can be concluded that the coarse-grained (CG) substrate work well in suppressing the strain localization in the NC Ni film.

  6. Synthesis Of NiCrAlC alloys by mechanical alloying

    International Nuclear Information System (INIS)

    Silva, A.K.; Pereira, J.I.; Vurobi Junior, S.; Cintho, O.M.

    2010-01-01

    The purpose of the present paper is the synthesis of nickel alloys (NiCrAlC), which has been proposed like a economic alternative to the Stellite family Co alloys using mechanical alloying, followed by sintering heat treatment of milled material. The NiCrAlC alloys consist of a chromium carbides dispersion in a Ni 3 Al intermetallic matrix, that is easily synthesized by mechanical alloying. The use of mechanical alloying enables higher carbides sizes and distribution control in the matrix during sintering. We are also investigated the compaction of the processed materials by compressibility curves. The milling products were characterized by X-ray diffraction, and the end product was featured by conventional metallography and scanning electronic microscopy (SEM), that enabled the identification of desired phases, beyond microhardness test, which has been shown comparable to alloys manufactured by fusion after heat treating. (author)

  7. The influence of local volume forces on surface relaxation of pure metals and alloys: Applications to Ni, Al, Ni3Al

    International Nuclear Information System (INIS)

    Savino, E.J.; Farkas, D.

    1987-11-01

    We present an analysis of the relative influence of the interatomic potential, lattice structure and defect symmetry on the calculated and measured distortion for the free surfaces of alloys and pure metals. In particular, the effect of using local ''volume'' dependent interactions is studied, as opposed to simple pair interatomic forces. The dependence of the relaxation on the lattice structure is examined by comparing pure metals with ordered alloys. A Green function method for surface relaxation is presented and used for the above analysis as well as for studying the influence of different surface symmetries. Examples based on computer simulation of Ni, Al and Ni 3 Al for some surface orientations are presented. (author). 33 refs, 4 figs

  8. Growth and Characteristic of Amorphous Nano-Granular TeO2-V2O5-NiO Thin Films

    Science.gov (United States)

    Hosseinzadeh, Sh.; Rahmati, A.; Bidadi, H.

    2016-12-01

    TeO2-V2O5-NiO thin films were deposited using thermal evaporation from 40TeO2-(60-y)V2O5-yNiO (y=0-30mol%) target. Structural analysis of the films was identified by X-ray diffractometry (XRD) and scanning electron microscopy (SEM). The amorphous TeO2-V2O5-NiO films have nanosized clear grain structure and sharp grain boundaries. DC conductivity and current-voltage (I-V) characteristic of TeO2-V2O5-NiO thin films were measured in the temperature range of 300-423K. As nickel oxide (NiO) content increases, the DC conductivity decreases up to two orders in value (10-9-10-11Sṡcm-1). Temperature dependence of conductivity is described using the small polaron hopping (SPH) model as well. Poole-Frenkel effect is observed at high external electric field. The optical absorption spectra of the TeO2-V2O5-NiO thin films were recorded in the wavelength range of 380-1100nm. The absorption coefficient revealed bandgap shrinkage (3.01-2.3eV) and band tail widening, due to an increase in NiO content. Energy dispersive X-ray spectroscopy (EDX) was used to determine elemental composition. In TeO2-V2O5-NiO thin films, the NiO content is around fifth of the initial target.

  9. Analysis of the influence of structure on mechanical properties of multilayer Ni/Cu thin films for use in microelectronic technologies

    Directory of Open Access Journals (Sweden)

    Lamovec Jelena S.

    2015-01-01

    Full Text Available Multilayer Ni/Cu thin films were produced by dual-bath electrodeposition technique (DBT on polycrystalline cold-rolled Cu substrate. Different Ni/Cu multilayer structures were realized by changing of process parameters such as total film thickness, sublayer thickness and Ni/Cu sublayer thickness ratio. The mechanical properties of Vickers microhardness and interfacial adhesion in the films were investigated. Decreasing of sublayer thickness down to 300 nm and increasing of Ni:Cu sublayer thickness ratio to 1:4, lead to higher values of Vickers microhardness compared to monolayer metal films. Thin films with sublayer thicknesses from 75 nm to 5 μm show strong interfacial adhesion. A weak adhesion and sublayer exfoliation for the films with sublayer thickness greater than 5μm were found. Three-dimensional Ni microstructures can be fabricated using multilayer Ni/Cu film by selective etching of Cu layers in an acidic thiourea solution ('surface micromachining' technique.

  10. Influence of structural transition on the electronic structures and physical properties of Ni2MnGa alloy films

    International Nuclear Information System (INIS)

    Kim, K. W.; Kudryavtsev, Y. V.; Rhee, J. Y.; Lee, N. N.; Lee, Y. P.

    2004-01-01

    Ordered and disordered Ni 2 MnGa alloy films were prepared by flash evaporation onto substrates maintained at 720 K and 150 K, respectively. The results show that the ordered films behave in nearly the same way as the bulk Ni 2 MnGa ferromagnetic shape-memory alloy, including the martensitic transformation at 200 K, while the disordered films exhibit characteristics of amorphous alloys. It was also found that the disordering in Ni 2 MnGa alloy films did not change to any appreciable magnetic ordering down to 4 K. Annealing of the disordered films restores the ordered structure with an almost full recovery of the magnetic, magneto-optical and transport properties of the ordered Ni 2 MnGa alloy films. It was also understood, for the first time, how the structural ordering in the films influences the physical properties, including the surprising loss of ferromagnetism in the disordered films, as a result of performing electronic-structure calculations.

  11. Insight into the product film formed on Ni-advanced weathering steel in a tropical marine atmosphere

    Science.gov (United States)

    Wu, Wei; Cheng, Xuequn; Hou, Huaxing; Liu, Bo; Li, Xiaogang

    2018-04-01

    The product film formed on Ni-advanced weathering steel in a tropical marine environment was investigated in detail through outdoor exposure by using diverse surface analysis techniques combined with electrochemical impedance spectroscopy and scanning kelvin probe measurements. The results showed that the product film was mainly composed of nanophasic goethite in the inner layer and maghemite, akaganeite, and hematite in the outer layer. Moreover, the resistance to atmospheric corrosion gradually increased from the outermost product film to the innermost film. Ni was significantly enriched in the inner layer in the form of the spinel phase NiFe2O4, which transformed lepidocrocite to fine-grained goethite, withstood the invasion of chloridion, and improved the corrosion potential of the product film in a tropical marine atmosphere.

  12. Pitting Corrosion of Ni3(Si,Ti+4Al Intermetallic Compound at Various Chloride Concentrations

    Directory of Open Access Journals (Sweden)

    Gadang Priyotomo

    2014-04-01

    Full Text Available The pitting corrosion of Ni3(Si,Ti with 4 at% Al consisting of two regions of a Ni3(Si,Ti single-phase of L12 structure and two phases of L12 and fcc Niss was investigated as function of chloride concentrations by using electrochemical method, scanning electron microscope and energy dispersive X-Ray spectroscopy in neutral sodium chloride solutions at 293 K.  In addition, the pitting corrosion of Ni3(Si,Ti and  type C276 alloy were also studied under the same experimental condition for comparison.  The pitting potential obtained for the Ni3(Si,Ti with 4 at%Al decreased with increasing chloride concentration.  The specific pitting potential and pitting potential of Ni3(Si,Ti with 4at%, Ni3(Si,Ti and C276 were the lowest, the moderate and the highest, respectively, which means that the pitting corrosion resistance of Ni3(Si,Ti was higher than Ni3(Si,Ti with 4at% Al, but lower than that of C276.  A critical chloride concentration of Ni3(Si,Ti with 4at% Al was found to be lower than that of Ni3(Si,Ti.  The Pitting corrosion of Ni3(Si,Ti with 4at% Al occurred in the two phase mixture (L12 + Niss.

  13. Combined effect of oxygen deficient point defects and Ni doping in radio frequency magnetron sputtering deposited ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Saha, B., E-mail: biswajit.physics@gmail.com [Thin Film and Nano Science Laboratory, Department of Physics, Jadavpur University, 700 032 Kolkata (India); Department of Physics, National Institute of Technology Agartala, Jirania 799046, Tripura (India); Das, N.S.; Chattopadhyay, K.K. [Thin Film and Nano Science Laboratory, Department of Physics, Jadavpur University, 700 032 Kolkata (India)

    2014-07-01

    Ni doped ZnO thin films with oxygen deficiency have been synthesized on glass substrates by radio frequency magnetron sputtering technique using argon plasma. The combined effect of point defects generated due to oxygen vacancies and Ni doping on the optical and electrical properties of ZnO thin films has been studied in this work. Ni doping concentrations were varied and the structural, optical and electrical properties of the films were studied as a function of doping concentrations. The films were characterized with X-ray diffractometer, UV–Vis–NIR spectrophotometer, X-ray photoelectron spectroscopy, atomic force microscopy and electrical conductivity measurements. Oxygen deficient point defects (Schottky defects) made the ZnO thin film highly conducting while incorporation of Ni dopant made it more functional regarding their electrical and optical properties. The films were found to have tunable electrical conductivity with Ni doping concentrations. - Highlights: • ZnO thin films prepared by radio frequency magnetron sputtering technique • Synthesis process was stimulated to introduce Schottky-type point defects. • Point defects and external doping of Ni made ZnO thin films more functional. • Point defect induced high electrical conductivity in ZnO thin film. • Significant shift in optical bandgap observed in ZnO with Ni doping concentrations.

  14. Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique

    Science.gov (United States)

    Song, Liang; Wang, Xianping; Wang, Le; Zhang, Ying; Liu, Wang; Jiang, Weibing; Zhang, Tao; Fang, Qianfeng; Liu, Changsong

    2017-04-01

    He-charged oxide dispersion strengthened (ODS) FeCrNi films were prepared by a radio-frequency (RF) plasma magnetron sputtering method in a He and Ar mixed atmosphere at 150 °C. As a comparison, He-charged FeCrNi films were also fabricated at the same conditions through direct current (DC) plasma magnetron sputtering. The doping of He atoms and Y2O3 in the FeCrNi films was realized by the high backscattered rate of He ions and Y2O3/FeCrNi composite target sputtering method, respectively. Inductive coupled plasma (ICP) and x-ray photoelectron spectroscopy (XPS) analysis confirmed the existence of Y2O3 in FeCrNi films, and Y2O3 content hardly changed with sputtering He/Ar ratio. Cross-sectional scanning electron microscopy (SEM) shows that the FeCrNi films were composed of dense columnar nanocrystallines and the thickness of the films was obviously dependent on He/Ar ratio. Nanoindentation measurements revealed that the FeCrNi films fabricated through DC/RF plasma magnetron sputtering methods exhibited similar hardness values at each He/Ar ratio, while the dispersion of Y2O3 apparently increased the hardness of the films. Elastic recoil detection (ERD) showed that DC/RF magnetron sputtered FeCrNi films contained similar He amounts (˜17 at.%). Compared with the minimal change of He level with depth in DC-sputtered films, the He amount decreases gradually in depth in the RF-sputtered films. The Y2O3-doped FeCrNi films were shown to exhibit much smaller amounts of He owing to the lower backscattering possibility of Y2O3 and the inhibition effect of nano-sized Y2O3 particles on the He element.

  15. Influence of additives on microstructures, mechanical properties and shock-induced reaction characteristics of Al/Ni composites

    Energy Technology Data Exchange (ETDEWEB)

    Xiong, Wei; Zhang, Xianfeng, E-mail: lynx@mail.njust.edu.cn; Wu, Yang; He, Yong; Wang, Chuanting; Guo, Lei

    2015-11-05

    Granular composites containing aluminum (Al) and nickel (Ni) are typical structural energetic materials, which possess ideal combination of both mechanical properties and energy release capability. The influence of two additives, namely Teflon (PTFE) and copper (Cu), on mechanical properties and shock-induced chemical reaction (SICR) characteristics of Al/Ni material system has been investigated. Three composites, namely Al/Ni, Al/Ni/PTFE and Al/Ni/Cu with same volumetric ratio of Al powder to Ni powder, were processed by means of static pressing. Scanning electron microscopy was used to study the microstructure of the mentioned three composites. Quasi static compression tests were also conducted to determine the mechanical properties and fracture behavior of the mentioned three composites. It was shown that the additives affected both compressive strength and fracture mode of the three composites. Impact initiation experiments on the mentioned three composites were performed to determine their shock-induced chemical reaction characteristics by considering pressure histories measured in the test chamber. The experimental results showed that the additives had significant effects on critical initiation velocity, reaction rate, reaction efficiency and post-reaction behavior. - Highlights: • .Al/Ni, Al/Ni/PTFE and Al/Ni/Cu were processed by means of static pressing. • .Microstructures, mechanical properties and shock-induced reactions were studied. • .Microstructures affect both compressive strength and fracture mode. • .Impact velocity is an important factor in shock-induced chemical characteristics. • .Each additive has significant effects on energy release behavior.

  16. Influence of additives on microstructures, mechanical properties and shock-induced reaction characteristics of Al/Ni composites

    International Nuclear Information System (INIS)

    Xiong, Wei; Zhang, Xianfeng; Wu, Yang; He, Yong; Wang, Chuanting; Guo, Lei

    2015-01-01

    Granular composites containing aluminum (Al) and nickel (Ni) are typical structural energetic materials, which possess ideal combination of both mechanical properties and energy release capability. The influence of two additives, namely Teflon (PTFE) and copper (Cu), on mechanical properties and shock-induced chemical reaction (SICR) characteristics of Al/Ni material system has been investigated. Three composites, namely Al/Ni, Al/Ni/PTFE and Al/Ni/Cu with same volumetric ratio of Al powder to Ni powder, were processed by means of static pressing. Scanning electron microscopy was used to study the microstructure of the mentioned three composites. Quasi static compression tests were also conducted to determine the mechanical properties and fracture behavior of the mentioned three composites. It was shown that the additives affected both compressive strength and fracture mode of the three composites. Impact initiation experiments on the mentioned three composites were performed to determine their shock-induced chemical reaction characteristics by considering pressure histories measured in the test chamber. The experimental results showed that the additives had significant effects on critical initiation velocity, reaction rate, reaction efficiency and post-reaction behavior. - Highlights: • .Al/Ni, Al/Ni/PTFE and Al/Ni/Cu were processed by means of static pressing. • .Microstructures, mechanical properties and shock-induced reactions were studied. • .Microstructures affect both compressive strength and fracture mode. • .Impact velocity is an important factor in shock-induced chemical characteristics. • .Each additive has significant effects on energy release behavior

  17. Low operating voltage InGaZnO thin-film transistors based on Al2O3 high-k dielectrics fabricated using pulsed laser deposition

    International Nuclear Information System (INIS)

    Geng, G. Z.; Liu, G. X.; Zhang, Q.; Shan, F. K.; Lee, W. J.; Shin, B. C.; Cho, C. R.

    2014-01-01

    Low-voltage-driven amorphous indium-gallium-zinc-oxide (IGZO) thin-film transistors (TFTs) with an Al 2 O 3 dielectric were fabricated on a Si substrate by using pulsed laser deposition. Both Al 2 O 3 and IGZO thin films are amorphous, and the thin films have very smooth surfaces. The Al 2 O 3 gate dielectric exhibits a very low leakage current density of 1.3 x 10 -8 A/cm 2 at 5 V and a high capacitance density of 60.9 nF/cm 2 . The IGZO TFT with a structure of Ni/IGZO/Al 2 O 3 /Si exhibits high performance with a low threshold voltage of 1.18 V, a high field effect mobility of 20.25 cm 2 V -1 s -1 , an ultra small subthreshold swing of 87 mV/decade, and a high on/off current ratio of 3 x 10 7 .

  18. Structural high-temperature and (βNiAl+γ)-alloys based on Ni-Al-Co-Me systems with an improved low-temperature ductility

    International Nuclear Information System (INIS)

    Povarova, K.B.; Kazanskaya, N.K.; Drozdov, A.A.; Lomberg, B.S.; Gerasimov, V.V.

    2001-01-01

    The βNiAl-based alloys (B2) have lower density higher resistance to oxidation, and higher melting temperature relative to those of Ni-superalloys or γ'Ni 3 Al-base alloys. An improved low-temperature ductility of advanced Ni-AI-Co-M β+γ alloys(El=9-16 % at 293-1173 K is achieved due to the formation γ-Ni solid solution intergranular interlayers of eutectic origin. Secondary γ and/or γ' precipitates form in the grains of the supersaturated β-solid solution upon heat treatment at 1473-1573 K and 1073-1173 K. The limiting contents of alloying elements (Ti, Hf, Nb, Ta, Cr, Mo) for the (β+γ) alloys Ni - (19-29) % AI - (22-35) % Co, are determined which allowed to avoid the formation of primary γ'-phase (decrease solidus temperature ≤1643 K) and hard phases of the types σ, η and δ (decrease ductility). Alloying affects the morphology of the secondary γ and γ' precipitates: globular equiaxed precipitates are formed in the alloys containing Cr, Mo, and needle precipitates are formed in alloys alloys containing γ'-forming elements Nb, Ta and, especially, Ti and Hf. After directional solidification, (β+γ')-alloys have directed columnar special structure with a low extension of transverse grain boundaries. This microstructure allows one to increase UTS, by a factor 1,5-2 and long-term strength (time to rupture increase by a factor of 5-10 at 1173 K). (author)

  19. Inkjet Printing as High-Throughput Technique for the Fabrication of NiCo2O4 Films

    Directory of Open Access Journals (Sweden)

    Reyna Dianela Bacelis-Martínez

    2017-01-01

    Full Text Available Owing to its distinctive physicochemical properties, nickel-cobalt mixed oxide (NiCo2O4 has become a promising and innovative material for applications in many technological fields. The design of fast and reliable techniques for the deposition of this material is essential in the development of applications. In this work, NiCo2O4 films were successfully prepared by an inkjet printing technique using a suitable ink obtained from metal nitrates in a glycerol-water mixture. In order to deposit well-defined and uniform film patterns, the instrumental parameters such as drop spacing and inkjet voltage have been explored. The pure crystalline bimetallic nickel cobaltite oxide is obtained at 500°C with a homogeneous compositional distribution along the film. The average thickness observed by scanning electron microscopy is around 490 nm, whereas X-ray photoelectron spectroscopy analysis revealed that the film surface presents mixed oxidation states for both metals: Co2+, Co3+, Ni2+, and Ni3+. The electrocatalytic performance of inkjet-printed NiCo2O4 films for the water oxidation reaction is comparable with earlier reports.

  20. Density of liquid NiCrAlMo quarternary alloys measured by a modified sessile drop method

    International Nuclear Information System (INIS)

    Fang, L.; Wang, Y.F.; Xiao, F.; Tao, Z.N.; MuKai, K.

    2006-01-01

    The densities of liquid NiCrAlMo quaternary alloys with a fixed molar ratio of Ni:Cr:Al (approximately as 73:14:13) and molybdenum concentration from 0 to 10 mass% were measured by a modified sessile drop method (MSDM). It was found that the density of the liquid NiCrAlMo quaternary alloys decreases with increasing temperature, but increases with the increase of molybdenum concentration. The molar volume of liquid NiCrAlMo quaternary alloys increases with the increase of temperature and molybdenum concentration. The density of liquid NiCrAlMo quaternary alloys calculated from the partial molar volumes of nickel, chromium, aluminum and molybdenum in the corresponding Ni-based binary alloys are in good agreement with the experimental results, means, within the error tolerance range the density of liquid Ni-based multi-component alloys can be predicted from the partial volumes of elements in Ni-based binary alloys in liquid state

  1. Effect of Precursor Concentration on Structural Optical and Electrical Properties of NiO Thin Films Prepared by Spray Pyrolysis

    Directory of Open Access Journals (Sweden)

    Rafia Barir

    2017-01-01

    Full Text Available Undoped nickel oxide (NiO thin films were deposited on 500°C heated glass substrates using spray pyrolysis method at (0.015–0.1 M range of precursor. The latter was obtained by decomposition of nickel nitrate hexahydrate in double distilled water. Effect of precursor concentration on structural, optical, and electrical properties of NiO thin films was investigated. X-ray diffraction (XRD shows the formation of NiO under cubic structure with single diffraction peak along (111 plane at 2θ=37.24°. When precursor concentration reaches 0.1 M, an increment in NiO crystallite size over 37.04 nm was obtained indicating the product nano structure. SEM images reveal that beyond 0.04 M as precursor concentration the substrate becomes completely covered with NiO and thin films exhibit formation of nano agglomerations at the top of the sample surface. Ni-O bonds vibrations modes in the product of films were confirmed by FT-IR analysis. Transparency of the films ranged from 57 to 88% and band gap energy of the films decreases from 3.68 to 3.60 eV with increasing precursor concentration. Electrical properties of the elaborated NiO thin films were correlated to the precursor concentration.

  2. Hydrogen Generation from Al-NiCl2/NaBH4 Mixture Affected by Lanthanum Metal

    Directory of Open Access Journals (Sweden)

    Wen Qiang Sun

    2012-01-01

    Full Text Available The effect of La on Al/NaBH4 hydrolysis was elaborated in the present paper. Hydrogen generation amount increases but hydrogen generation rate decreases with La content increasing. There is an optimized composition that Al-15 wt% La-5 wt% NiCl2/NaBH4 mixture (Al-15 wt% La-5 wt% NiCl2/NaBH4 weight ratio, 1 : 3 has 126 mL g−1 min−1 maximum hydrogen generation rate and 1764 mL g−1 hydrogen generation amount within 60 min. The efficiency is 88%. Combined with NiCl2, La has great effect on NaBH4 hydrolysis but has little effect on Al hydrolysis. Increasing La content is helpful to decrease the particle size of Al-La-NiCl2 in the milling process, which induces that the hydrolysis byproduct Ni2B is highly distributed into Al(OH3 and the catalytic reactivity of Ni2B/Al(OH3 is increased therefore. But hydrolysis byproduct La(OH3 deposits on Al surface and leads to some side effect. The Al-La-NiCl2/NaBH4 mixture has good stability in low temperature and its hydrolytic performance can be improved with increasing global temperature. Therefore, the mixture has good safety and can be applied as on board hydrogen generation material.

  3. Hydrogen generation from Al-NiCl2/NaBH4 mixture affected by lanthanum metal.

    Science.gov (United States)

    Sun, Wen Qiang; Fan, Mei-Qiang; Fei, Yong; Pan, Hua; Wang, Liang Liang; Yao, Jun

    2012-01-01

    The effect of La on Al/NaBH(4) hydrolysis was elaborated in the present paper. Hydrogen generation amount increases but hydrogen generation rate decreases with La content increasing. There is an optimized composition that Al-15 wt% La-5 wt% NiCl(2)/NaBH(4) mixture (Al-15 wt% La-5 wt% NiCl(2)/NaBH(4) weight ratio, 1 : 3) has 126 mL g(-1 )min(-1) maximum hydrogen generation rate and 1764 mL g(-1) hydrogen generation amount within 60 min. The efficiency is 88%. Combined with NiCl(2), La has great effect on NaBH(4) hydrolysis but has little effect on Al hydrolysis. Increasing La content is helpful to decrease the particle size of Al-La-NiCl(2) in the milling process, which induces that the hydrolysis byproduct Ni(2)B is highly distributed into Al(OH)(3) and the catalytic reactivity of Ni(2)B/Al(OH)(3) is increased therefore. But hydrolysis byproduct La(OH)(3) deposits on Al surface and leads to some side effect. The Al-La-NiCl(2)/NaBH(4) mixture has good stability in low temperature and its hydrolytic performance can be improved with increasing global temperature. Therefore, the mixture has good safety and can be applied as on board hydrogen generation material.

  4. Hydrothermally formed three-dimensional nanoporous Ni(OH)2 thin-film supercapacitors.

    Science.gov (United States)

    Yang, Yang; Li, Lei; Ruan, Gedeng; Fei, Huilong; Xiang, Changsheng; Fan, Xiujun; Tour, James M

    2014-09-23

    A three-dimensional nanoporous Ni(OH)2 thin-film was hydrothermally converted from an anodically formed porous layer of nickel fluoride/oxide. The nanoporous Ni(OH)2 thin-films can be used as additive-free electrodes for energy storage. The nanoporous layer delivers a high capacitance of 1765 F g(-1) under three electrode testing. After assembly with porous activated carbon in asymmetric supercapacitor configurations, the devices deliver superior supercapacitive performances with capacitance of 192 F g(-1), energy density of 68 Wh kg(-1), and power density of 44 kW kg(-1). The wide working potential window (up to 1.6 V in 6 M aq KOH) and stable cyclability (∼90% capacitance retention over 10,000 cycles) make the thin-film ideal for practical supercapacitor devices.

  5. Preparation of hcp-Ni(112-bar 0) epitaxial thin films on Au(100) single-crystal underlayers

    Energy Technology Data Exchange (ETDEWEB)

    Ohtake, Mitsuru; Tanaka, Takahiro; Futamoto, Masaaki [Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo-ku, Tokyo 112-8551 (Japan); Kirino, Fumiyoshi, E-mail: ohtake@futamoto.elect.chuo-u.ac.j [Graduate School of Fine Arts, Tokyo National University of Fine Arts and Music, 12-8 Ueno-koen, Taito-ku, Tokyo 110-8714 (Japan)

    2010-01-01

    Ni epitaxial films with an hcp structure are successfully obtained on Au(100) single-crystal underlayers formed on MgO(100) substrates at temperatures lower than 300 {sup 0}C by molecular beam epitaxy. With increasing the substrate temperature, the volume ratio of more stable fcc phase inc{sub r}eases in the film. The Ni film prepared at 100 {sup 0}C consists primarily of hcp crystal with the (112-bar 0) plane parallel to the substrate surface coexisting with a small amount of fcc-Ni(100) crystal. The lattice constant of hcp-Ni crystal is determined as a = 0.249 nm, c = 0.398 nm, and c/a = 1.60.

  6. Effect of Phosphine Doping and the Surface Metal State of Ni on the Catalytic Performance of Ni/Al2O3 Catalyst

    Directory of Open Access Journals (Sweden)

    Xiaoru Li

    2015-04-01

    Full Text Available Ni-based catalysts as replacement for noble metal catalysts are of particular interest in the catalytic conversion of biomass due to their cheap and satisfactory catalytic activity. The Ni/SiO2 catalyst has been studied for the hydrogenolysis of glycerol, and doping with phosphorus (P found to improve the catalytic performance significantly because of the formation of Ni2P alloys. However, in the present work we disclose a different catalytic phenomenon for the P-doped Ni/Al2O3 catalyst. We found that doping with P has a significant effect on the state of the active Ni species, and thus improves the selectivity to 1,2-propanediol (1,2-PDO significantly in the hydrogenolysis of glycerol, although Ni-P alloys were not observed in our catalytic system. The structure and selectivity correlations were determined from the experimental data, combining the results of X-ray diffraction (XRD, X-ray photoelectron spectroscopy (XPS, hydrogen temperature-programmed reduction (H2-TPR and ammonia temperature-programmed desorption (NH3-TPD. The presence of NiO species, formed from P-doped Ni/Al2O3 catalyst, was shown to benefit the formation of 1,2-PDO. This was supported by the results of the Ni/Al2O3 catalyst containing NiO species with incomplete reduction. Furthermore, the role the NiO species played in the reaction and the potential reaction mechanism over the P-doped Ni/Al2O3 catalyst is discussed. The new findings in the present work open a new vision for Ni catalysis and will benefit researchers in designing Ni-based catalysts.

  7. Structure investigations of ferromagnetic Co-Ni-Al alloys obtained by powder metallurgy.

    Science.gov (United States)

    Maziarz, W; Dutkiewicz, J; Lityńska-Dobrzyńska, L; Santamarta, R; Cesari, E

    2010-03-01

    Elemental powders of Co, Ni and Al in the proper amounts to obtain Co(35)Ni(40)Al(25) and Co(40)Ni(35)Al(25) nominal compositions were ball milled in a high-energy mill for 80 h. After 40 h of milling, the formation of a Co (Ni, Al) solid solution with f.c.c. structure was verified by a change of the original lattice parameter and crystallite size. Analytical transmission electron microscopy observations and X-ray diffraction measurements of the final Co (Ni, Al) solid solution showed that the crystallite size scattered from 4 to 8 nm and lattice parameter a = 0.36086 nm. The chemical EDS point analysis of the milled powder particles allowed the calculation of the e/a ratio and revealed a high degree of chemical homogeneity of the powders. Hot pressing in vacuum of the milled powders resulted in obtaining compacts with a density of about 70% of the theoretical one. An additional heat treatment increased the density and induced the martensitic transformation in a parent phase. Selected area diffraction patterns and dark field images obtained from the heat-treated sample revealed small grains around 300 nm in diameter consisting mainly of the ordered gamma phase (gamma'), often appearing as twins, and a small amount of the L1(0) ordered martensite.

  8. Electroplated Fe-Co-Ni films prepared in ammonium-chloride-based plating baths

    Science.gov (United States)

    Yanai, T.; Koda, K.; Kaji, J.; Aramaki, H.; Eguchi, K.; Takashima, K.; Nakano, M.; Fukunaga, H.

    2018-05-01

    We electroplated Fe-Co-Ni films in ammonium-chloride-based plating baths, and investigated the effect of the Co content on the magnetic properties and the structural ones of the as-plated films. The coercivity increased abruptly when the Co content become more than 60 at.%. As the rough surfaces were observed in the high Co content region, we considered that degradation of the surface is a factor of the abrupt increase in the coercivity. From the XRD analysis, we found that another factor of the abrupt increase is fcc-bcc phase transformation, and concluded that we need to keep the fcc structure to obtain Fe-Co-Ni films with low coercivity.

  9. Magnetic dichroism and spin structure of antiferromagnetic NiO(001) films

    NARCIS (Netherlands)

    Altieri, S; Finazzi, M; Hsieh, HH; Lin, HJ; Chen, CT; Hibma, T; Valeri, S; Sawatzky, GA

    2003-01-01

    We find that Ni L-2 edge x-ray magnetic linear dichroism is fully reversed for NiO(001) films on materials with reversed lattice mismatch. We relate this phenomenon to a preferential stabilization of magnetic S domains with main spin component either in or out of the plane, via dipolar interactions.

  10. Defects of Al-Ni joints caused by Kirkendall – Frenkel effect

    Directory of Open Access Journals (Sweden)

    K. Garbala

    2010-01-01

    Full Text Available In this paper Kirkendall – Frenkel effects occurring in bimetallic Al-Ni couples has been subjected detailed analysis. The aim of this work was to conduct the model research describing the mechanism of connection zone formation at the aluminum-nickel contact. Al-Ni samples were annealed at temperatures below the melting point of aluminum for a specified periods of time. In the sample annealed at 640°C for 48 hours Frenkel porosity occurrence has been observed. Maximum pore surfaces share in this area is 35÷40%. Diffusion influences in this case can be divided into three zones differing values of component elements concentrations. Microhardness test of these zones reviled that the greatest hardness has Al3Ni2 phase equal to 1533HV0,1.

  11. Potentiodynamic polarization studies of bulk amorphous alloy Zr57Cu15.4Ni12.6Al10Nb5 and Zr59Cu20Ni8Al10Ti3 in aqueous HNO3 media

    International Nuclear Information System (INIS)

    Sharma, Poonam; Dhawan, Anil; Jayraj, J.; Kamachi Mudali, U.

    2013-01-01

    The potentiodynamic polarization studies were carried out on Zr based bulk amorphous alloy Zr 57 Cu 15.4 Ni 12.6 Al 10 Nb 5 and Zr 59 Cu 20 Ni 8 Al 10 Ti 3 in solutions of 1 M, 6 M and 11.5 M HNO 3 aqueous media at room temperature. As received specimens of Zr 57 Cu 15.4 Ni 12.6 Al 10 Nb 5 (5 mm diameter rod) and Zr 59 Cu 20 Ni 8 Al 10 Ti 3 (3 mm diameter rod) were polished with SiC paper before testing them for potentiodynamic polarization studies. The amorphous nature of the specimens was checked by X-ray diffraction. The bulk amorphous alloy Zr 59 Cu 20 Ni 8 Al 10 Ti 3 shows the better corrosion resistance than Zr 57 Cu 15.4 Ni 12.6 Al 10 Nb 5 alloy in the aqueous HNO 3 media as the value of the corrosion current density (I corr ) for Zr 57 Cu 15.4 Ni 12.6 Al 10 Nb 5 alloy were found to be more than Zr 59 Cu 20 Ni 8 Al 10 Ti 3 alloy in aqueous HNO 3 media. The improved corrosion resistance of Zr 59 Cu 20 Ni 8 Al 10 Ti 3 alloy is possibly due to the presence of Ti and formation of TiO 2 during anodic oxidation. Both Zr based bulk amorphous alloys shows wider passive range at lower concentration of nitric acid and the passive region gets narrowed down with the increase in concentration. A comparison of data obtained from both the Zr-based bulk amorphous alloys is made and results are discussed in the paper. (author)

  12. Magnetic, structural and magnetocaloric properties of Ni-Si and Ni-Al thermoseeds for self-controlled hyperthermia.

    Science.gov (United States)

    Pandey, Sudip; Quetz, Abdiel; Aryal, Anil; Dubenko, Igor; Mazumdar, Dipanjan; Stadler, Shane; Ali, Naushad

    2017-11-01

    Self-controlled hyperthermia is a non-invasive technique used to kill or destroy cancer cells while preserving normal surrounding tissues. We have explored bulk magnetic Ni-Si and Ni-Al alloys as a potential thermoseeds. The structural, magnetic and magnetocaloric properties of the samples were investigated, including saturation magnetisation, Curie temperature (T C ), and magnetic and thermal hysteresis, using room temperature X-ray diffraction and magnetometry. The annealing time, temperature and the effects of homogenising the thermoseeds were studied to determine the functional hyperthermia applications. The bulk Ni-Si and Ni-Al binary alloys have Curie temperatures in the desired range, 316 K-319 K (43 °C-46 °C), which is suitable for magnetic hyperthermia applications. We have found that T C strictly follows a linear trend with doping concentration over a wide range of temperature. The magnetic ordering temperature and the magnetic properties can be controlled through substitution in these binary alloys.

  13. Impact of deposition rate on the structural and magnetic properties of sputtered Ni/Cu multilayer thin films

    Energy Technology Data Exchange (ETDEWEB)

    Karpuz, Ali [Karamanoglu Mehmetbey Univ., Karaman (Turkey). Dept. of Physics; Colmekci, Salih; Kockar, Hakan; Kuru, Hilal; Uckun, Mehmet [Balikesir Univ. (Turkey). Dept. of Physics

    2018-04-01

    The structural and corresponding magnetic properties of Ni/Cu films sputtered at low and high deposition rates were investigated as there is a limited number of related studies in this field. 5[Ni(10 nm)/Cu(30 nm)] multilayer thin films were deposited using two DC sputtering sources at low (0.02 nm/s) and high (0.10 nm/s) deposition rates of Ni layers. A face centered cubic phase was detected for both films. The surface of the film sputtered at the low deposition rate has a lot of micro-grains distributed uniformly and with sizes from 0.1 to 0.4 μm. Also, it has a vertical acicular morphology. At high deposition rate, the number of micro-grains considerably decreased, and some of their sizes increased up to 1 μm. The surface of the Ni/Cu multilayer deposited at the low rate has a relatively more grainy and rugged structure, whereas the surface of the film deposited at the high rate has a relatively larger lateral size of surface grains with a relatively fine morphology. Saturation magnetisation, M{sub s}, values were 90 and 138 emu/cm{sup 3} for deposition rates of 0.02 and 0.10 nm/s, respectively. Remanence, M{sub r}, values were also found to be 48 and 71 emu/cm{sup 3} for the low and high deposition rates, respectively. The coercivity, H{sub c}, values were 46 and 65 Oe for the low and high Ni deposition rates, respectively. The changes in the film surfaces provoked the changes in the H{sub c} values. The M{sub s}, M{sub r}, and H{sub c} values of the 5[Ni(10 nm)/Cu(30 nm)] films can be adjusted considering the surface morphologies and film contents caused by the different Ni deposition rates.

  14. Density of Ni-Al Alloys in Liquid and Solid-Liquid Coexistence State Measured by a Modified Pycnometric Method

    Institute of Scientific and Technical Information of China (English)

    Liang FANG; Feng XIAO; Zushu LI; Zainan TAO

    2004-01-01

    The density of Ni-Al alloys in both liquid state and solid-liquid coexistence state was measured with a modified pycnometric method. It was found that the density of NI-Al alloys decreases with increasing temperature and Al concentration in the alloys. The molar volume of liquid Ni-Al binary alloys increases with the increase of temperature and Al concentration. The partial molar volume of Al in NI-Al binary alloy was calculated approximately. The molar volume of liquid NI-Al alloy determined in the present work shows a negative deviation from the ideal linear molar volume.

  15. Nanocrystalline Pd:NiFe{sub 2}O{sub 4} thin films: A selective ethanol gas sensor

    Energy Technology Data Exchange (ETDEWEB)

    Rao, Pratibha; Godbole, R.V.; Bhagwat, Sunita, E-mail: smb.agc@gmail.com

    2016-10-15

    In this work, Pd:NiFe{sub 2}O{sub 4} thin films were investigated for the detection of reducing gases. These films were fabricated using spray pyrolysis technique and characterized using X-ray diffraction (XRD) to confirm the crystal structure. The surface morphology was studied using scanning electron microscopy (SEM). Magnetization measurements were carried out using SQUID VSM, which shows ferrimagnetic behavior of the samples. These thin film sensors were tested against methanol, ethanol, hydrogen sulfide and liquid petroleum gas, where they were found to be more selective to ethanol. The fabricated thin film sensors exhibited linear response signal for all the gases with concentrations up to 5 w/o Pd. Reduction in optimum operating temperature and enhancement in response was also observed. Pd:NiFe{sub 2}O{sub 4} thin films exhibited faster response and recovery characteristic. These sensors have potential for industrial applications because of their long-term stability, low power requirement and low production cost. - Highlights: • Ethanol gas sensors based on Pd:NiFe{sub 2}O{sub 4} nanoparticle thin film were fabricated. • Pd incorporation in NiFe{sub 2}O{sub 4} matrix inhibits grain growth. • The sensors were more selective to ethanol gas. • Sensors exhibited fast response and recovery when doped with palladium. • Pd:NiFe{sub 2}O{sub 4} thin film sensor displays excellent long–term stability.

  16. New insight into electrochemical-induced synthesis of NiAl2O4/Al2O3: Synergistic effect of surface hydroxyl groups and magnetism for enhanced adsorptivity of Pd(II)

    International Nuclear Information System (INIS)

    Salleh, N.F.M.; Jalil, A.A.; Triwahyono, S.; Efendi, J.; Mukti, R.R.; Hameed, B.H.

    2015-01-01

    Graphical abstract: - Highlights: • The introduction of Ni to γ-Al 2 O 3 by electrolysis formed NiAl 2 O 4 spinels and NiO. • Physical mixed of NiO with γ-Al 2 O 3 only produced agglomerated NiO-Ni 0 . • Ni/Al 2 O 3 -E has remarkably higher degree of magnetism than Ni/Al 2 O 3 -PM. • Ni/Al 2 O 3 -E adsorbed Pd 2+ ions more effectively (q m = 40.3 mg/g) than Ni/Al 2 O 3 -PM. • Pd 2+ ions were adsorbed to both samples via magnetic attraction and ion exchange. - Abstract: A new promising adsorbent, Ni supported on γ-Al 2 O 3 was prepared in a simple electrolysis system (Ni/Al 2 O 3 -E) in minutes and was compared with the sample prepared by a physical mixing method (Ni/Al 2 O 3 -PM). The adsorbents were characterized by XRD, TEM, FTIR, 27 Al MAS NMR, XPS, and VSM. The results showed that besides NiO nanoparticles, a NiAl 2 O 4 spinel was also formed in Ni/Al 2 O 3 -E during the electrolysis via the dealumination and isomorphous substitution of Ni 2+ ions. In contrast, only agglomerated NiO was found in the Ni/Al 2 O 3 -PM. Adsorption test on removal of Pd 2+ ions from aqueous solution showed that the Pd 2+ ions were exchanged with the hydrogen atoms of the surface–OH groups of both adsorbents. Significantly, the Ni/Al 2 O 3 -E demonstrated a higher adsorption towards Pd 2+ ions than Ni/Al 2 O 3 -PM due to its remarkably higher degree of magnetism, which came from the NiAl 2 O 4 . The use of 0.1 g L −1 Ni/Al 2 O 3 -E gave the maximum monolayer adsorption capacity (q m ) of 40.3 mg g −1 at 303 K and pH 5. The Ni/Al 2 O 3 -E showed high potential for simultaneous removal of various noble and transition metal ions and could be also used repetitively without affecting the high adsorptivity for Pd 2+ ions. This work may provide promising adsorbents for recovery of various metals as well as other materials for such related applications

  17. Zr-Cu-Ni-Al bulk metallic glasses with superhigh glass-forming ability

    International Nuclear Information System (INIS)

    Sun, Y.J.; Qu, D.D.; Huang, Y.J.; Liss, K.-D.; Wei, X.S.; Xing, D.W.; Shen, J.

    2009-01-01

    Zr-Cu-Ni-Al quaternary amorphous alloy compositions with varying glass-forming ability are developed by an efficient method of proportional mixing of binary eutectics. The critical diameter of the glassy sample is improved from 6 mm for Zr 53 Cu 18.7 Ni 12 Al 16.3 to 14 mm for Zr 50.7 Cu 28 Ni 9 Al 12.3 by straightforwardly adjusting the eutectic unit's coefficients. The drastic improvement in GFA is attributed to balancing the chemical affinities of the Zr, Cu, Ni and Al components in the melt prior to solidification which makes the precipitation of competing crystalline phases more difficult. As the glass-forming ability increases, the concentration of Cu in the alloys exhibits a same trend. Based on synchrotron radiation high-energy X-ray diffraction analysis and Miracle's structural model, it is envisioned that the substitution of additional Cu atoms for Zr atoms in the investigated alloys stabilizes the efficient cluster packing structure of the amorphous alloys, leading to the pronounced increase in their glass-forming ability

  18. Magnetic domains in Ni-Mn-Ga martensitic thin films

    International Nuclear Information System (INIS)

    Chernenko, V A; Anton, R Lopez; Kohl, M; Ohtsuka, M; Orue, I; Barandiaran, J M

    2005-01-01

    A series of martensitic Ni 52 Mn 24 Ga 24 thin films deposited on alumina ceramic substrates has been prepared by using RF(radio-frequency) magnetron sputtering. The film thickness, d, varies from 0.1 to 5.0m. Magnetic domain patterns have been imaged by the MFM (magnetic force microscopy) technique. A maze domain structure is found for all studied films. MFM shows a large out-of-plane magnetization component and a rather uniform domain width for each film thickness. The domain width, δ, depends on the film thickness as δ∝√d in the whole studied range of film thickness. This dependence is the expected one for magnetic anisotropy and magnetostatic contributions in a perpendicular magnetic domain configuration. The proportionality coefficient is also consistent with the values of saturation magnetization and magnetic anisotropy determined in the samples

  19. The properties of transparent TiO2 films for Schottky photodetector

    Directory of Open Access Journals (Sweden)

    Sung-Ho Park

    2017-08-01

    Full Text Available In this data, the properties of transparent TiO2 film for Schottky photodetector are presented for the research article, entitled as “High-performing transparent photodetectors based on Schottky contacts” (Patel et al., 2017 [1]. The transparent photoelectric device was demonstrated by using various Schottky metals, such as Cu, Mo and Ni. This article mainly shows the optical transmittance of the Ni-transparent Schottky photodetector, analyzed by the energy dispersive spectroscopy and interfacial TEM images for transparency to observe the interface between NiO and TiO2 film. The observation and analyses clearly show that no pinhole formation in the TiO2 film by Ni diffusion. The rapid thermal process is an effective way to form the quality TiO2 film formation without degradation, such as pinholes (Qiu et al., 2015 [2]. This thermal process may apply to form functional metal oxide layers for solar cells and photodetectors.

  20. Ab initio thermodynamic properties of stoichiometric phases in the Ni-Al system

    International Nuclear Information System (INIS)

    Arroyave, R.; Shin, D.; Liu, Z.-K.

    2005-01-01

    In this work the thermodynamic properties of Al, Ni, NiAl and Ni 3 Al were obtained through ab initio methods. Through the use of density functional theory within the generalized gradient approximation and projector augmented-wave (PAW) pseudopotentials, the 0 K energetics of the structures were calculated. The supercell method was used to calculate the vibrational contributions to the free energy. The contribution of electronic degrees of freedom to the total free energy was also included in the calculations. The resulting free energy was used to calculate the enthalpies and entropies of the structures investigated. The comparison with experimental data is satisfactory, and the calculations compare well with recent results using linear response theory

  1. Influence of discharge voltage on the sensitivity of the resultant sputtered NiO thin films toward hydrogen gas

    Energy Technology Data Exchange (ETDEWEB)

    Khalaf, Mohammed K. [Center of Applied Physics, Directorate of Materials Research, Ministry of Science and Technology, Baghdad (Iraq); Mutlak, Rajaa H. [Dept. of Physics, College of Science, University of Baghdad, Ministry of Higher Education and Scientific Research, Baghdad (Iraq); Khudiar, Ausama I., E-mail: ausamaikhudiar@yahoo.com [Center of Applied Physics, Directorate of Materials Research, Ministry of Science and Technology, Baghdad (Iraq); Hial, Qahtan G. [Dept. of Physics, College of Science, University of Baghdad, Ministry of Higher Education and Scientific Research, Baghdad (Iraq)

    2017-06-01

    Nickel oxide thin films were deposited on glass substrates as the main gas sensor for H{sub 2} by the DC sputtering technique at various discharge voltages within the range of 1.8–2.5 kV. Their structural, optical and gas sensing properties were investigated by XRD, AFM, SEM, ultraviolet visible spectroscopy and home-made gas sensing measurement units. A diffraction peak in the direction of NiO (200) was observed for the sputtered films, thereby indicating that these films were polycrystalline in nature. The optical band gap of the films decreased from 3.8 to 3.5 eV when the thickness of the films was increased from 83.5 to 164.4 nm in relation to an increase in the sputtering discharge voltage from 1.8 to 2.5 kV, respectively. The gas sensitivity performance of the NiO films that were formed was studied and the electrical responses of the NiO-based sensors toward different H{sub 2} concentrations were also considered. The sensitivity of the gas sensor increased with the working temperature and H{sub 2} gas concentration. The thickness of the NiO thin films was also an important parameter in determining the properties of the NiO films as H{sub 2} sensors. It was shown in this study that NiO films have the capability to detect H{sub 2} concentrations below 3% in wet air, a feature that allows this material to be used directly for the monitoring of the environment.

  2. Simulation and experimental analysis of nanoindentation and mechanical properties of amorphous NiAl alloys.

    Science.gov (United States)

    Wang, Chih-Hao; Fang, Te-Hua; Cheng, Po-Chien; Chiang, Chia-Chin; Chao, Kuan-Chi

    2015-06-01

    This paper used numerical and experimental methods to investigate the mechanical properties of amorphous NiAl alloys during the nanoindentation process. A simulation was performed using the many-body tight-binding potential method. Temperature, plastic deformation, elastic recovery, and hardness were evaluated. The experimental method was based on nanoindentation measurements, allowing a precise prediction of Young's modulus and hardness values for comparison with the simulation results. The indentation simulation results showed a significant increase of NiAl hardness and elastic recovery with increasing Ni content. Furthermore, the results showed that hardness and Young's modulus increase with increasing Ni content. The simulation results are in good agreement with the experimental results. Adhesion test of amorphous NiAl alloys at room temperature is also described in this study.

  3. Magnetism, microstructure and First Principles calculations of atomized and annealed Ni{sub 3}Al

    Energy Technology Data Exchange (ETDEWEB)

    García-Escorial, A., E-mail: age@cenim.csic.es [CENIM-CSIC, Avda. Gregorio del Amo, 8, 28040 Madrid (Spain); Crespo, P.; Hernando, A. [Instituto de Magnetismo Aplicado, IMA-UCM, P.O. Box 155, 28230 Madrid (Spain); Lieblich, M. [CENIM-CSIC, Avda. Gregorio del Amo, 8, 28040 Madrid (Spain); Marín, P.; Velasco, V. [Instituto de Magnetismo Aplicado, IMA-UCM, P.O. Box 155, 28230 Madrid (Spain); Ynduráin, F. [Dpto. de Física de la Materia Condensada, UAM, Cantoblanco, 28049 Madrid (Spain)

    2014-12-05

    Highlights: • The microstructure and order of as-atomized Ni{sub 3}Al powder change with annealing. • The change of the magnetic properties shows the influence of the chemical order. • First Principles calculations show the effect of the density of states to the order. - Abstract: In this work Ni{sub 3}Al powder particles obtained by atomization were characterized magnetically and microstructurally in as-atomized state and after annealing. Upon annealing the X-ray diffraction patterns show a noticeable increase of the signal of the ordered phase γ′-Ni{sub 3}Al, L1{sub 2}, phase and the microstructure evolves from a lamellar and dendrite to a large grain microstructure. The Curie temperature of the as-atomized powder particles is 85 K and decreases after annealing down to 50 K. First Principles calculations were carried out to correlate the experimental observations with local order of Ni and Al atoms and illustrate the importance of the local order in the density of states at the Fermi level, showing how the magnetic moment depends on the Ni and Al atomic position.

  4. Nitrogen implantation of Ti and Ti+Al films deposited on tool steel

    International Nuclear Information System (INIS)

    Huang, C.-T.; Duh, J.-G.

    1995-01-01

    Titanium and aluminum thin films were deposited onto A2 steel by rf magnetron sputtering with various Al contents. The coated assembly was then implanted with nitrogen ions at 92 kV and 1 mA for 4.5 h. The thickness of the implanted Ti and Ti+Al films deposited for 1 h was around 0.4-0.5 μm. With the aid of X-ray diffraction by the grazing-incidence technique, secondary ion mass spectrum (SIMS) and X-ray photoelectron spectroscopy (XPS), the titanium oxide and titanium nitride were identified on the top and inner surface in the implanted Ti film. For Ti+Al films after nitrogen implantation, Ti 3 O 5 was formed on the top surface beneath which is a (Ti, Al) N solid solution. There was Ti 2 N compound formed in the implanted Ti film, while only a minor amount of Ti 2 N phase was observed in the inner region in the implanted Ti+Al film. The nitrogen distribution was flattened and spread in the implanted Ti film, while a concentration gradient was observed in the Ti+Al film after implantation. The measured surface hardness of implanted Ti film was higher than those of Ti+Al films and the hardness of implanted Ti+39%Al film was enhanced as compared to the Ti+50%Al film. (Author)

  5. A structural study of effects of NiP seed layer on the magnetic properties of CoCrPt/Ti/NiP perpendicular magnetic films

    CERN Document Server

    Sun, C J; Wang, J P; Soo, E W; Noh, D Y; Je, J H; Hwu, Y K

    2003-01-01

    The CoCrPt/Ti/NiP films for perpendicular magnetic recording were studied using X-ray scattering and anomalous X-ray scattering. When the NiP seed layer was used, the long range order of the texture peak of the magnetic film decreased and less Co was associated with this Bragg order. The structural results were consistent with the observed increased coercivity and decreased magnetization due to the increased magnetic grain isolation caused by the presence of NiP seed layer.

  6. Epitaxial growth of fcc Ti films on Al(001) surfaces

    International Nuclear Information System (INIS)

    Saleh, A.A.; Shutthanandan, V.; Shivaparan, N.R.; Smith, R.J.; Tran, T.T.; Chambers, S.A.

    1997-01-01

    High-energy ion scattering (HEIS), x-ray photoelectron spectroscopy, and x-ray photoelectron diffraction (XPD) were used to study the growth of thin Ti films on Al(001) surfaces. The Al surface peak area in the backscattered ion spectrum of MeV He + ions, incident along the [00 bar 1] direction, was used to monitor the atomic structure of the Ti films during growth. An initial decrease in the area was observed indicating epitaxial film growth. This decrease continued up to a critical film thickness of about 5.5 ML, after which point the structure of the film changed. Titanium films 3, 5, and 9 ML thick were characterized using XPD in the same chamber. Both the HEIS and XPD results show that the Ti films grow with an fcc structure on Al(001). A tetragonal distortion of 2.4% in the fcc Ti film was measured using ions incident along the [10 bar 1] direction. Although there is a general similarity of fcc Ti growth on both Al(001) and Al(110), the submonolayer growth regime does show differences for the two surfaces. copyright 1997 The American Physical Society

  7. Diffusivities of an Al-Fe-Ni melt and their effects on the microstructure during solidification

    International Nuclear Information System (INIS)

    Zhang Lijun; Du Yong; Steinbach, Ingo; Chen Qing; Huang Baiyun

    2010-01-01

    A systematical investigation of the diffusivities in an Al-Fe-Ni melt was presented. Based on the experimental and theoretical data about diffusivities, the temperature- and composition-dependent atomic mobilities were evaluated for the elements in Al-Ni, Al-Fe, Fe-Ni and Al-Fe-Ni melts via an effective approach. Most of the reported diffusivities can be reproduced well by the obtained atomic mobilities. In particular, for the first time the ternary diffusivity of the liquid in a ternary system is described in conjunction with the established atomic mobilities. The effect of the atomic mobilities in a liquid on microstructure and microsegregation during solidification was demonstrated with one Al-Ni binary alloy. The simulation results indicate that accurate databases of mobilities in the liquid phase are much needed for the quantitative simulation of microstructural evolution during solidification by using various approaches, including DICTRA and the phase-field method.

  8. The dynamics of femtosecond pulsed laser removal of 20 nm Ni films from an interface

    Energy Technology Data Exchange (ETDEWEB)

    Schrider, Keegan J.; Yalisove, Steven M. [Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States); Torralva, Ben [Department of Atmospheric, Oceanic, and Space Sciences, University of Michigan, Ann Arbor, Michigan 48109 (United States)

    2015-09-21

    The dynamics of femtosecond laser removal of 20 nm Ni films on glass substrates was studied using time-resolved pump-probe microscopy. 20 nm thin films exhibit removal at two distinct threshold fluences, removal of the top 7 nm of Ni above 0.14 J/cm{sup 2}, and removal of the entire 20 nm film above 0.36 J/cm{sup 2}. Previous work shows the top 7 nm is removed through liquid spallation, after irradiation the Ni melts and rapidly expands leading to tensile stress and cavitation within the Ni film. This work shows that above 0.36 J/cm{sup 2} the 20 nm film is removed in two distinct layers, 7 nm and 13 nm thick. The top 7 nm layer reaches a speed 500% faster than the bottom 13 nm layer at the same absorbed fluence, 500–2000 m/s and 300–700 m/s in the fluence ranges studied. Significantly different velocities for the top 7 nm layer and bottom 13 nm layer indicate removal from an interface occurs by a different physical mechanism. The method of measuring film displacement from the development of Newton's rings was refined so it could be shown that the 13 nm layer separates from the substrate within 70 ps and accelerates to its final velocity within several hundred picoseconds. We propose that removal of the bottom 13 nm is consistent with heterogeneous nucleation and growth of vapor at the Ni-glass interface, but that the rapid separation and acceleration of the 13 nm layer from the Ni-glass interface requires consideration of exotic phases of Ni after excitation.

  9. Deposition of Fe-Ni nanoparticles on Al2O3 for dechlorination of chloroform and trichloroethylene

    International Nuclear Information System (INIS)

    Hsieh, S.-H.; Horng, J.-J.

    2006-01-01

    This research proposes an efficient method for depositing Fe-Ni nanoparticles on Al 2 O 3 microparticles to decompose containments in ground water, such as chloroform and trichloroethylene. The Fe-Ni nanoparticles can be deposited onto the surface of Al 2 O 3 microparticles by electroless plating technique. The reasons why the Fe-Ni nanoparticles would be deposited on the surface of Al 2 O 3 microparticles is to avoid the agglomeration of Fe-Ni nanoparticles due to their surface effect and magnetic property. The results show that the sizes of Fe-Ni particles on Al 2 O 3 particles are between several and several hundreds of nanometers, the contents of Fe and Ni in Fe-Ni nanoparticles can be adjusted from 8 to 60 at.% for Fe and 40 to 92 at.% for Ni, the specific surface area of Fe-Ni nanoparticles can reach to 117 m 2 /g, and the reaction mechanism of dechlorination of chloroform of 2 mg/L by Fe-Ni/Al 2 O 3 particles of 5 g/L appears to be pseudo first order with a half life of 0.7 h and the half life is 0.25 h for the dechlorination of trichloroethylene of 2 mg/L

  10. High Temperature Oxidation Behavior of gamma-Ni+gamma'-Ni3Al Alloys and Coatings Modified with Pt and Reactive Elements

    Energy Technology Data Exchange (ETDEWEB)

    Mu, Nan [Iowa State Univ., Ames, IA (United States)

    2007-12-01

    Materials for high-pressure turbine blades must be able to operate in the high-temperature gases (above 1000 C) emerging from the combustion chamber. Accordingly, the development of nickel-based superalloys has been constantly motivated by the need to have improved engine efficiency, reliability and service lifetime under the harsh conditions imposed by the turbine environment. However, the melting point of nickel (1455 C) provides a natural ceiling for the temperature capability of nickel-based superalloys. Thus, surface-engineered turbine components with modified diffusion coatings and overlay coatings are used. Theses coatings are capable of forming a compact and adherent oxide scale, which greatly impedes the further transport of reactants between the high-temperature gases and the underlying metal and thus reducing attack by the atmosphere. Typically, these coatings contain β-NiAl as a principal constituent phase in order to have sufficient aluminum content to form an Al2O3 scale at elevated temperatures. The drawbacks to the currently-used {beta}-based coatings, such as phase instabilities, associated stresses induced by such phase instabilities, and extensive coating/substrate interdiffusion, are major motivations in this study to seek next-generation coatings. The high-temperature oxidation resistance of novel Pt + Hf-modified γ-Ni + γ-Ni3Al-based alloys and coatings were investigated in this study. Both early-stage and 4-days isothermal oxidation behavior of single-phase γ-Ni and γ'-Ni3Al alloys were assessed by examining the weight changes, oxide-scale structures, and elemental concentration profiles through the scales and subsurface alloy regions. It was found that Pt promotes Al2O3 formation by suppressing the NiO growth on both γ-Ni and γ'Ni3Al single-phase alloys. This effect increases with increasing Pt content. Moreover, Pt exhibits this effect even at

  11. Temperature dependent optical characterization of Ni-TiO2 thin films as potential photocatalytic material

    Science.gov (United States)

    De, Rajnarayan; Haque, S. Maidul; Tripathi, S.; Rao, K. Divakar; Singh, Ranveer; Som, T.; Sahoo, N. K.

    2017-09-01

    Along with other transition metal doped titanium dioxide materials, Ni-TiO2 is considered to be one of the most efficient materials for catalytic applications due to its suitable energy band positions in the electronic structure. The present manuscript explores the possibility of improving the photocatalytic activity of RF magnetron sputtered Ni-TiO2 films upon heat treatment. Optical, structural and morphological and photocatalytic properties of the films have been investigated in detail for as deposited and heat treated samples. Evolution of refractive index (RI) and total film thickness as estimated from spectroscopic ellipsometry characterization are found to be in agreement with the trend in density and total film thickness estimated from grazing incidence X-ray reflectivity measurement. Interestingly, the evolution of these macroscopic properties were found to be correlated with the corresponding microstructural modifications realized in terms of anatase to rutile phase transformation and appearance of a secondary phase namely NiTiO3 at high temperature. Corresponding morphological properties of the films were also found to be temperature dependent which leads to modifications in the grain structure. An appreciable reduction of optical band gap from 2.9 to 2.5 eV of Ni-TiO2 thin films was also observed as a result of post deposition heat treatment. Testing of photocatalytic activity of the films performed under UV illumination demonstrates heat treatment under atmospheric ambience to be an effective means to enhance the photocatalytic efficiency of transition metal doped titania samples.

  12. Resistencia a la corrosión a alta temperatura de recubrimientos NiCrAlY y NiCrFeNbMoTiAl depositados por APS

    Directory of Open Access Journals (Sweden)

    José Luis Tristancho-Reyes

    2014-12-01

    Full Text Available La corrosión a alta temperatura de las tuberías utilizadas en equipos generadores de vapor (calderas ha sido reconocida como un grave problema que trae consigo el adelgazamiento de éstas y, por consiguiente, la falla de los equipos. En la última década se han incrementado las investigaciones que involucran recubrimientos protectores que ayudan de alguna manera a prolongar la vida útil de estos equipos. Esta investigación determinó el comportamiento de los recubrimientos NiCrAlY y NiCrFeNbMoTiAl depositados por proyección térmica asistida por plasma (APS sobre la aleación SA213 – T22 (2¼Cr – 1Mo, en un ambiente corrosivo de 80%V2O5–20%K2SO4 a 800°C. Los valores de la cinética de corrosión fueron determinados mediante resistencia a la polarización lineal (RPL y espectroscopia de impedancia electroquímica (EIE. Los resultados obtenidos muestran una menor cinética de corrosión en el recubrimiento NiCrFeNbMoTiAl que la presentada por el recubrimiento NiCrAlY, corroborado por Microscopia Electrónica de Barrido (MEB.

  13. Structural and Electromagnetic Properties of Ni-Mn-Ga Thin Films Deposited on Si Substrates

    Directory of Open Access Journals (Sweden)

    Pereira M. J.

    2014-07-01

    Full Text Available Ni2MnGa thin films raise great interest due to their properties, which provide them with strong potential for technological applications. Ni2MnGa thin films were prepared by r.f. sputtering deposition on Si substrates at low temperature (400 ºC. Film thicknesses in the range 10-120 nm were obtained. A study of the structural, magnetic and electrical properties of the films is presented. We find that the deposited films show some degree of crystallinity, with coexisting cubic and tetragonal structural phases, the first one being preponderant over the latter, particularly in the thinner films. The films possess soft magnetic properties and their coercivity is thickness dependent in the range 15-200 Oe at 300K. Electrical resistivity measurements signal the structural transition and suggest the occurrence of avalanche and return-point memory effects, in temperature cycling through the magnetic/structural transition range.

  14. Microstructural evolution of neutron-irradiated Ni-Si and Ni-Al alloys

    Science.gov (United States)

    Takahashi, H.; Garner, F. A.

    1992-10-01

    Additions of silicon and aluminum suppress the neutron-induced swelling of pure nickel but to different degrees. Silicon is much more effective initially when compared to aluminum on a per atom basis but silicon exhibits a nonmonotonic influence on swelling with increasing concentration. Silicon tends to segregate toward grain boundaries while aluminum segregates away from these boundaries. Whereas the formation of the Ni 3Si phase is frequently observed in charged particle irradiation experiments conducted at much higher displacement rates, it did not occur during neutron irradiation in this study. Precipitation also did not occur in Ni-5Al during neutron irradiation, nor has it been reported to occur during ion irradiation.

  15. Microstructural evolution of neutron-irradiated Ni-Si and Ni-Al alloys

    International Nuclear Information System (INIS)

    Takahashi, H.; Garner, F.A.

    1992-01-01

    Additions of silicon and aluminium suppress the neutron-induced swelling of pure nickel but to different degrees. Silicon is much more effective initially when compared to aluminium on a per atom basis but silicon exhibits a nonmonotonic influence on swelling with increasing concentration. Silicon tends to segregate toward grain boundaries while aluminium segregates away from these boundaries. Whereas the formation of the Ni 3 Si phase is frequently observed in charged particle irradiation experiments conducted at much higher displacement rates, it did not occur during neutron irradiation in this study. Precipitation also did not occur in Ni-5Al during neutron irradiation, nor has it been reported to occur during ion irradiation. (orig.)

  16. Surface study and thickness control of thin Al2O3 film on Cu-9%Al(111) single crystal

    International Nuclear Information System (INIS)

    Yamauchi, Yasuhiro; Yoshitake, Michiko; Song Weijie

    2004-01-01

    We were successful in growing a uniform flat Al 2 O 3 film on the Cu-9%Al(111) surface using the improved cleaning process, low ion energy and short time sputtering. The growth of ultra-thin film of Al 2 O 3 on Cu-9%Al was investigated using Auger electron spectroscopy (AES) and a scanning electron microscope (SEM). The Al 2 O 3 film whose maximum thickness was about 4.0 nm grew uniformly on the Cu-9%Al surface. The Al and O KLL Auger peaks of Al 2 O 3 film shifted toward low kinetic energy, and the shifts were related to Schottky barrier formation and band bending at the Al 2 O 3 /Cu-9%Al interface. The thickness of Al 2 O 3 film on the Cu-9%Al surface was controlled by the oxygen exposure

  17. Transparent conducting properties of Ni doped zinc oxide thin films prepared by a facile spray pyrolysis technique using perfume atomizer

    Energy Technology Data Exchange (ETDEWEB)

    Bouaoud, A.; Rmili, A.; Ouachtari, F.; Louardi, A.; Chtouki, T. [Laboratoire des Hautes Energies, Sciences de l' Ingenierie et Reacteurs (LHESIR), Equipe Ingenierie et Materiaux (INMA), Departement de Physique, Faculte des Sciences, Kenitra (Morocco); Elidrissi, B., E-mail: e.bachir@mailcity.com [Laboratoire des Hautes Energies, Sciences de l' Ingenierie et Reacteurs (LHESIR), Equipe Ingenierie et Materiaux (INMA), Departement de Physique, Faculte des Sciences, Kenitra (Morocco); Erguig, H. [Laboratoire des Hautes Energies, Sciences de l' Ingenierie et Reacteurs (LHESIR), Equipe Ingenierie et Materiaux (INMA), Departement de Physique, Faculte des Sciences, Kenitra (Morocco); Ecole Nationale des Sciences Appliquees de Kenitra (ENSAK) (Morocco)

    2013-01-15

    Undoped and Ni doped zinc oxide (Ni-ZnO) thin films were prepared by a facile spray pyrolysis technique using perfume atomizer from aqueous solution of anhydrous zinc acetate (Zn(CH{sub 3}COOH){sub 2} and hexahydrated nickel chloride (NiCl{sub 2}{center_dot}6H{sub 2}O) as sources of zinc and nickel, respectively. The films were deposited onto the amorphous glass substrates kept at (450 Degree-Sign C). The effect of the [Ni]/[Zn] ratio on the structural, morphological, optical and electrical properties of Ni doped ZnO thin film was studied. It was found from X-ray diffraction (XRD) analysis that both the undoped and Ni doped ZnO films were crystallized in the hexagonal structure with a preferred orientation of the crystallites along the [002] direction perpendicular to the substrate. The scanning electron microscopy (SEM) images showed a relatively dense surface structure composed of crystallites in the spherical form whose average size decreases when the [Ni]/[Zn] ratio increases. The optical study showed that all the films were highly transparent. The optical transmittance in the visible region varied between 75 and 85%, depending on the dopant concentrations. The variation of the band gap versus the [Ni]/[Zn] ratio showed that the energy gap decreases from 2.95 to 2.72 eV as the [Ni]/[Zn] ratio increases from 0 to 0.02 and then increases to reach 3.22 eV for [Ni]/[Zn] = 0.04. The films obtained with the [Ni]/[Zn] ratio = 0.02 showed minimum resistivity of 2 Multiplication-Sign 10{sup -3} {Omega} cm at room temperature. -- Highlights: Black-Right-Pointing-Pointer The optical transmittance of Ni doped ZnO varies between 75 and 85%. Black-Right-Pointing-Pointer The energy gap of these films decreases from 2.95 to 2.72 eV as the [Ni]/[Zn] ratio increases from 0 to 0.02. Black-Right-Pointing-Pointer The energy gap increases to reach 3.22 eV for [Ni]/[Zn] = 0.04. Black-Right-Pointing-Pointer The films obtained with [Ni]/[Zn] ratio = 0.02 show minimum resistivity of 2

  18. Structural characterization of metastable hcp-Ni thin films epitaxially grown on Au(100) single-crystal underlayers

    International Nuclear Information System (INIS)

    Ohtake, Mitsuru; Tanaka, Takahiro; Futamoto, Masaaki; Kirino, Fumiyoshi

    2010-01-01

    Ni(1120) epitaxial thin films with hcp structure were prepared on Au(100) single-crystal underlayers at 100 deg. C by ultra high vacuum molecular beam epitaxy. The detailed film structure is studied by in situ reflection high energy electron diffraction, x-ray diffraction, and transmission electron microscopy. The hcp-Ni film consists of two types of variants whose c-axes are rotated around the film normal by 90 deg. each other. An atomically sharp boundary is recognized between the film and the underlayer, where misfit dislocations are introduced. Presence of such dislocations seems to relieve the strain caused by the lattice mismatch between the film and the underlayer.

  19. Investigation of blue luminescence in Mg doped AlN films

    Energy Technology Data Exchange (ETDEWEB)

    Sun, Xiliang; Xiong, Juan, E-mail: xiongjuana@163.com; Zhang, Weihai; Liu, Lei; Gu, Haoshuang, E-mail: guhsh@hubu.edu.cn

    2015-02-05

    Highlights: • AlN films doped with 0.8–4.4 at.% Mg were deposited by magnetron sputtering. • Structural and photoluminescence properties of Mg-doped AlN films were synthesized in detailed. • A broad blue band centered at 420 nm and 440 nm was observed in Mg-doped AlN films. • An enhancement of A1 (TO) mod and a slightly blue-shift of E2 (high) mode were observed. - Abstract: The Al{sub 1−x}Mg{sub x}N thin films were deposited on (1 0 0) silicon substrates by magnetron sputtering. The structural and photoluminescence properties of the films with varying Mg concentrations were analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), Raman spectra and photoluminescence (PL), respectively. The results clearly showed that the Mg atoms successfully incorporated into AlN, while the crystal structure of the films was maintained. The Raman spectra of Al{sub 1−x}Mg{sub x}N films reveals the enhancement of A{sub 1} (TO) mode, a slightly blue-shift and an augment in FWHM for E{sub 2} (high) phonon mode with increasing Mg content, which can be associated with the deterioration of (0 0 2) orientation and the appearance of (1 0 0) orientation. A broad blue band centered at 420 nm and 440 nm was observed in Mg-doped AlN films. It was suggested that the transitions from the shallow donor level not only to the ground state but also to the excited states of the deep level was responsible for the broad blue emission band. This work indicates the AlN film for the application in lighting emission devices.

  20. Sintering of (Ni,Mg)(Al,Fe)2O4 Materials and their Corrosion Process in Na3AlF6-AlF3-K3AlF6 Electrolyte

    Science.gov (United States)

    Xu, Yibiao; Li, Yawei; Yang, Jianhong; Sang, Shaobai; Wang, Qinghu

    2017-06-01

    The application of ledge-free sidewalls in the Hall-Héroult cells can potentially reduce the energy requirement of aluminum production by about 30 pct (Nightingale et al. in J Eur Ceram, 33:2761-2765, 2013). However, this approach poses great material challenges since such sidewalls are in direct contact with corrosive electrolyte. In the present paper, (Ni,Mg)(Al,Fe)2O4 materials were prepared using fused magnesia, reactive alumina, nickel oxide, and iron oxide powders as the starting materials. The sintering behaviors of specimens as well as their corrosion resistance to molten electrolyte have been investigated by means of X-ray diffraction and scanning electron microscope. The results show that after firing at temperature ranging from 1673 K (1400 °C) up to 1873 K (1600 °C), all the specimens prepared are composed of single-phase (Ni,Mg)(Al,Fe)2O4 composite spinel, the lattice parameter of which increases with increasing Fe3+ ion concentration. Increasing the iron oxide content enhances densification of the specimens, which is accompanied by the formation of homogeneously distributed smaller pores in the matrix. The corrosion tests show that corrosion layers consist of fluoride and Ni(Al,Fe)2O4 composite spinel grains are produced in specimens with Fe/Al mole ratio no more than 1, whereas dense Ni(Al,Fe)2O4 composite spinel layers are formed on the surface of the specimens with Fe/Al mole ratio more than 1. The dense Ni(Al,Fe)2O4 composite spinel layers formed improve the corrosion resistance of the specimens by inhibiting the infiltration of electrolyte and hindering the chemical reaction between the specimen and electrolyte.

  1. Corrosion Inhibition Study of Al-Cu-Ni Alloy in Simulated Sea-Water ...

    African Journals Online (AJOL)

    A study on the inhibition of Al-Cu-Ni alloy in simulated sea-water environment was investigated using Sodium Chromate as inhibitor. The inhibitor concentration was varied as control, 0.25, 0.5, 1.0, 1.5 and 2.0 Molar. Al-Cu-Ni alloy was sand cast into cylindrical bars of 20 mm x 300 mm dimension. The corrosion of the ...

  2. Comparative study of the characteristics of Ni films deposited on SiO2/Si(100) by oblique-angle sputtering and conventional sputtering

    International Nuclear Information System (INIS)

    Yu Mingpeng; Qiu Hong; Chen Xiaobai; Wu Ping; Tian Yue

    2008-01-01

    Ni films were deposited on SiO 2 /Si(100) substrates at 300 K and 573 K by oblique-angle sputtering and conventional sputtering. The films deposited at 300 K mainly have a [110] crystalline orientation in the growing direction whereas those deposited at 573 K grow with a [111] crystalline orientation in the growing direction. The film prepared only at 300 K by oblique-angle sputtering grows with a weakly preferential orientation along the incidence direction of the sputtered Ni atoms. All the films grow with thin columnar grains perpendicular to the substrate surface. The grain size of the films sputter-deposited obliquely is larger than that of the films sputter-deposited conventionally. The grain size of the Ni film does not change markedly with the deposition temperature. The film deposited at 573 K by oblique-angle sputtering has the highest saturation magnetization. For the conventional sputtering, the coercivity of the Ni film deposited at 573 K is larger than that of the film deposited at 300 K. However, for the oblique-angle sputtering, the coercivity of the Ni film is independent of the deposition temperature. All the Ni films exhibit an isotropic magnetization characteristic in the film plane

  3. Diffusion dynamics in liquid and undercooled Al-Ni alloys

    Energy Technology Data Exchange (ETDEWEB)

    Stueber, Sebastian

    2009-10-05

    This work presents data on Ni self-diffusion in binary Al-Ni alloys with high precision. For this, we combined two techniques: containerless electromagnetic levitation to position the samples, and neutron time-of-flight spectroscopy to measure the decay of the self-correlation. This combination offers new measurement ranges, especially at low temperatures, several hundreds of Kelvin below the liquidus temperature. Because without container, the primary cristallization seeds for the metallic melt are avoided. But it is also possible to measure reactive samples, and at very high temperatures at and above 2000K, as problematic reactions with the containing cask won't occur. Furthermore this technique also enables measurements at higher momentum transfer q, as one does not have to limit the q-range of the measurement to avoid Bragg peaks of the solid container material. By this time-of-flight spectroscopy on levitated metallic melts, it is possible to determine the Ni self-diffusion in these alloys directly and on an absolute scale. The dependence of the Ni self-diffusion coefficient on temperature and concentration was studied in pure Ni and binary Al-Ni alloys. In a temperature range of several hundred degrees, we always found Arrhenius-like temperature dependence of the diffusion, irrespective of possible undercooling. In the context of these measurements, we also studied the interdependence between diffusivity in the metallic melt and its quasielastic structure factor. Time-of-flight spectroscopy made it also possible to derive the dynamic partial structure factors of the binary alloy Al{sub 80}Ni{sub 20}. All this to enable a better understanding of the atomic processes in the metallic melt, especially of the undercooled melt, as an alloy is always formed out of the (undercooled) melt of its stoichiometric compounds. For this, material transport and diffusion are immensely important. The final goal would be materials design from the melt, i.e. the prediction

  4. Diffusion dynamics in liquid and undercooled Al-Ni alloys

    International Nuclear Information System (INIS)

    Stueber, Sebastian

    2009-01-01

    This work presents data on Ni self-diffusion in binary Al-Ni alloys with high precision. For this, we combined two techniques: containerless electromagnetic levitation to position the samples, and neutron time-of-flight spectroscopy to measure the decay of the self-correlation. This combination offers new measurement ranges, especially at low temperatures, several hundreds of Kelvin below the liquidus temperature. Because without container, the primary cristallization seeds for the metallic melt are avoided. But it is also possible to measure reactive samples, and at very high temperatures at and above 2000K, as problematic reactions with the containing cask won't occur. Furthermore this technique also enables measurements at higher momentum transfer q, as one does not have to limit the q-range of the measurement to avoid Bragg peaks of the solid container material. By this time-of-flight spectroscopy on levitated metallic melts, it is possible to determine the Ni self-diffusion in these alloys directly and on an absolute scale. The dependence of the Ni self-diffusion coefficient on temperature and concentration was studied in pure Ni and binary Al-Ni alloys. In a temperature range of several hundred degrees, we always found Arrhenius-like temperature dependence of the diffusion, irrespective of possible undercooling. In the context of these measurements, we also studied the interdependence between diffusivity in the metallic melt and its quasielastic structure factor. Time-of-flight spectroscopy made it also possible to derive the dynamic partial structure factors of the binary alloy Al 80 Ni 20 . All this to enable a better understanding of the atomic processes in the metallic melt, especially of the undercooled melt, as an alloy is always formed out of the (undercooled) melt of its stoichiometric compounds. For this, material transport and diffusion are immensely important. The final goal would be materials design from the melt, i.e. the prediction of alloy

  5. Optical and electrical properties of Mn1.56Co0.96Ni0.48O4 thin films

    Science.gov (United States)

    Gao, Y. Q.; Huang, Z. M.; Hou, Y.; Wu, J.; Chu, J. H.

    2013-12-01

    Mn1.56Co0.96Ni0.48O4 (MCN) films with different layers have been prepared on Al2O3 substrate by chemical solution deposition method. The microstructures, optical and electrical properties of the films are investigated. X-ray diffraction and microstructure analyses show good crystallization and both the crystalline quality and the grain size are improved with the increasing thickness of the films. Mid-infrared optical properties of MCN films have been investigated using transmission spectra. The results show the red shift of absorption with the increasing film thickness and the energy gap Eg decrease from 0.6422 eV to 0.6354 eV. All the MCN films show an exponential decrease in the resistivity with increasing temperature within the measured range. The temperature dependence resistivity can be described by the small polarons hopping model. Using this model, the characteristic temperature T0 and activation energy E of the MCN films were derived. With the film thickness increase, the T0 and E of the MCN films increase. The calculated room temperature coefficient of resistance (TCR) of MCN film with 100 layers is -3.5% K-1. The MCN films showed appropriate resistance and high value of TCR, these advantages make them very preponderant for thermal sensors.

  6. Preparation and characterization of LaNiO3 films grown by metal ...

    Indian Academy of Sciences (India)

    Administrator

    Keywords. Conductive films; LaNiO3; metal–organic deposition; texture. 1. Introduction ... films on Si (111) and quartz substrates were first prepared with the 2-ethyl hexanotes of ..... Li A, Ge C, Lü P and Ming N 1996a Appl. Phys. Lett. 68. 1347.

  7. Electronic Topological Transitions in CuNiMnAl and CuNiMnSn under pressure from first principles study

    Science.gov (United States)

    Rambabu, P.; Kanchana, V.

    2018-06-01

    A detailed study on quaternary ordered full Heusler alloys CuNiMnAl and CuNiMnSn at ambient and under different compressions is presented using first principles electronic structure calculations. Both the compounds are found to possess ferromagnetic nature at ambient with magnetic moment of Mn being 3.14 μB and 3.35 μB respectively in CuNiMnAl and CuNiMnSn. The total magnetic moment for both the compounds is found to decrease under compression. Fermi surface (FS) topology change is observed in both compounds under pressure at V/V0 = 0.90, further leading to Electronic Topological Transitions (ETTs) and is evidenced by the anomalies visualized in density of states and elastic constants under compression.

  8. Structure analysis of NiAl martensite

    International Nuclear Information System (INIS)

    Noda, Y.; Shapiro, S.M.; Shirane, G.; Yamada, Y.; Fuchizaki, K.; Tanner, L.E.

    1989-01-01

    Neutron elastic scattering experiments were performed in order to investigate the structure of the low temperature martensitic phase of Ni 62.5 Al 37.5 alloy. The average structure analyzed from the integrated intensity was approximately described by the (5,-2) structure proposed by Martynov et al. Small deviation from the exact (5,-2) model in the positional parameters and the anomalously large Debye-Waller factor were obtained. The observed satellite profiles show asymmetrical broadening, and the peak positions shift from the regular reciprocal lattice points. These anomalous features of scattering profiles were tentatively interpreted by introducing spatial modulation of the strain and order parameters. 12 refs., 2 figs., 1 tab

  9. Hydroconversion of methyl laurate on bifunctional Ni2P/AlMCM-41 catalyst prepared via in situ phosphorization using triphenylphosphine

    Science.gov (United States)

    Zhao, Sha; Zhang, Zhena; Zhu, Kongying; Chen, Jixiang

    2017-05-01

    A series of Ni2P/AlMCM-41-x bifunctional catalysts with different Si/Al ratios (x) were synthesized by in situ phosphorization of Ni/AlMCM-41-x with triphenylphosphine (nominal Ni/P ratio of 0.75) at 300 °C on a fixed-bed reactor. For comparison, NiP/AlMCM-41-5-TPR was also prepared by the TPR method from the supported nickel phosphate with the Ni/P ratio of 1.0, during which metallic Ni rather than Ni2P formed. TEM images show that Ni and Ni2P particles uniformly distributed in Ni2P/AlMCM-41-x and NiP/AlMCM-41-5-TPR. The Ni2P/AlMCM-41-x acidity increased with decreasing the Si/Al ratio. In the hydroconversion of methyl laurate, the conversions were close to 100% on all catalysts at 360 °C, 3.0 MPa, methyl laurate WHSV of 2 h-1 and H2/methyl laurate ratio of 25. As to Ni2P/AlMCM-41-x, with decreasing the Si/Al ratio, the total selectivity to C11 and C12 hydrocarbons decreased, while the total selectivity to isoundecane and isododecane (Si-C11+i-C12) firstly increased and then decreased. Ni2P/AlMCM-41-5 gave the largest Si-C11+i-C12 of 43.2%. While NiP/AlMCM-41-5-TPR gave higher Si-C11+i-C12 than Ni2P/AlMCM-41-5, it was more active for the undesired Csbnd C bond cleavage and methanation. We propose that the in-situ phosphorization adopted here is a promising approach to preparing Ni2P-based bifunctional catalysts.

  10. Study the microstructure of three and four component phases in Al-Ni-Fe-La alloys

    KAUST Repository

    Kolobylina, Natalia

    2016-12-21

    Aluminium alloys play a key role in modern engineering since they are the most used non-ferrous material. They have been widely used in automotive, aerospace, and construction engineering due to their good corrosion resistance, superior mechanical properties along with good machinability, weldability, and relatively low cost. The progress in practical application has been determined by intensive research and development works on the Al alloys. A new class of Al–REM–TM aluminum alloys (REM indicates rare earth metal and TM is transition metal) was revealed in the end of the last century. These alloys differ from conventional ones by their extraordinary ability to form metal glasses and nanoscale composites in a wide range of compositions. Having low density, these alloys possess unique mechanical characteristics and corrosion resistance. Two as received alloys, namely Al85Ni9Fe2La4 and Al85Ni7Fe4La4 were obtained in the form of ingots from melts of corresponding compositions upon cooling in air were studied by scanning/transmission electron microscopy (STEM), energy dispersive X-ray (EDX) microanalysis and X-ray diffraction (XRD). The microstructural analyses were performed in a aberration corrected TITAN 80-300 TEM/STEM (FEI, USA) attached with EDX spectrometer with ultrathin window (EDAX, USA). The specimens for transmission electron microscopy (TEM) were prepared by an electrochemical or ion etching. It was found that the received alloys exhibits along with fcc Al and Al4La (Al11La3) particles, these alloys contain a ternary phase Al3Ni1 Fe isostructural to the Al3Ni phase and a quaternary phase Al8Fe2 NiLa isostructural to the Al8Fe2Eu phase and monoclinic phase Al9(Fe,Ni)2 isostructural to the Al9Co2. The study by HRSTEM together with a new atomic resolution energy dispersive X-ray microanalysis method demonstrated that Fe and Ni atoms substituted one another in the Al8Fe2–NiLa quaternary compound. Besides, several types of defects were determined: first

  11. Effects of glycine and current density on the mechanism of electrodeposition, composition and properties of Ni-Mn films prepared in ionic liquid

    Science.gov (United States)

    Guo, Jiacheng; Guo, Xingwu; Wang, Shaohua; Zhang, Zhicheng; Dong, Jie; Peng, Liming; Ding, Wenjiang

    2016-03-01

    The effects of glycine on the mechanism of electrodeposition of Ni-Mn alloy film prepared in ChCl-urea ionic liquid were studied in order to control the composition, microstructure and properties of the film. The cyclic voltammograms revealed that the presence of glycine in the ionic liquid can inhibit the reduction of Ni2+ ions but promote the reduction of Mn2+ ions in the cathodic scan. However, it promoted the dissolution of both Ni and Mn deposits in the ChCl-urea ionic liquids during the reverse scan. Glycine changed the mode of Ni-Mn film growth from Volmer-Weber mode into Stranski-Krastanov mode. The Mn content in the Ni-Mn film increased with the increase of concentration of glycine and current density. The Ni-Mn alloy film with 3.1 at.% Mn exhibited the lowest corrosion current density of 3 × 10-7 A/cm2 compared with other films prepared and exhibited better corrosion resistance than pure Ni film in 3.5 wt.% NaCl solution.

  12. Thermal barrier coatings with a double-layer bond coat on Ni{sub 3}Al based single-crystal superalloy

    Energy Technology Data Exchange (ETDEWEB)

    Zhou, Xin [State Key Laboratory of Rare Earth Resource Utilization, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022 (China); University of Chinese Academy of Sciences, Beijing 100049 (China); Beijing Institute of Aeronautical Materials, Department 5, P.O. Box 81-5, Beijing 100095 (China); Xu, Zhenhua; Mu, Rende [Beijing Institute of Aeronautical Materials, Department 5, P.O. Box 81-5, Beijing 100095 (China); He, Limin, E-mail: he_limin@yahoo.com [Beijing Institute of Aeronautical Materials, Department 5, P.O. Box 81-5, Beijing 100095 (China); Huang, Guanghong [Beijing Institute of Aeronautical Materials, Department 5, P.O. Box 81-5, Beijing 100095 (China); Cao, Xueqiang, E-mail: xcao@ciac.ac.cn [State Key Laboratory of Rare Earth Resource Utilization, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022 (China)

    2014-04-05

    Highlights: • Thermal barrier coatings with a double-layer bond coat of (Ni,Pt)Al and NiCrAlYSi. • Good adherence at all interfaces within TBC system. • The underlying (Ni,Pt)Al layer can supply abundant Al content for the upper NiCrAlYSi layer. • Crack nucleation, propagation and coalescence lead to the failure of coating. -- Abstract: Electron-beam physical vapor deposited thermal barrier coatings (TBCs) with a double-layer bond coat of (Ni,Pt)Al and NiCrAlYSi were prepared on a Ni{sub 3}Al based single-crystal superalloy. Phase and cross-sectional microstructure of the developed coatings were studied by using X-ray diffraction (XRD) and scanning electron microscope (SEM), respectively. The experimental results show good adherence at all interfaces within this system. Furthermore, oxidation resistance and elements interdiffusion behavior of the double-layer bond coat were also investigated. The double-layer bond coat system exhibits a better scale adherence than the single layer bond coat systems since the underlying (Ni,Pt)Al layer can supply abundant Al for the upper NiCrAlYSi layer. Finally, thermal cycling behavior of the double-layer bond coat TBC was evaluated and the failure mechanism was discussed. Crack nucleation, propagation and coalescence caused by TGO growth stress and the thermal expansion mismatch stress between TGO and bond coat can be mainly responsible for the spallation of this coating.

  13. Amperometric glucose sensor based on the Ni(OH){sub 2}/Al(OH){sub 4}{sup −} electrode obtained from a thin Ni{sub 3}Al foil

    Energy Technology Data Exchange (ETDEWEB)

    Jarosz, Magdalena, E-mail: jarosz@chemia.uj.edu.pl [Department of Physical Chemistry and Electrochemistry, Faculty of Chemistry, Jagiellonian University, Ingardena 3, 30060 Krakow (Poland); Socha, Robert P. [Jerzy Haber Institute of Catalysis and Surface Chemistry Polish Academy of Sciences, Niezapominajek 8, 30239 Krakow (Poland); Jóźwik, Paweł [Faculty of Advanced Technology and Chemistry, Military University of Technology, Kaliskiego 2, 00908 Warsaw (Poland); Sulka, Grzegorz D. [Department of Physical Chemistry and Electrochemistry, Faculty of Chemistry, Jagiellonian University, Ingardena 3, 30060 Krakow (Poland)

    2017-06-30

    Highlights: • Chemical etching of Ni{sub 3}Al alloy in an acidic mixture was performed. • Electrochemical activity of samples was achieved by their oxidation in NaOH. • Ni(OH){sub 2}/Al(OH){sub 4}{sup −} electrode showed electrochemical activity towards glucose. • Synthesized material is characterized by high sensitivity and short response time. - Abstract: In this report, we present a facile and relatively fast method to roughen the surface of Ni{sub 3}Al–based intermetallic foil, and test it as an amperometric non-enzymatic glucose sensor. The alloy samples underwent chemical etching in a H{sub 3}PO{sub 4}:CH{sub 3}COOH (HAc):HNO{sub 3}:H{sub 2}O (24:1:1:7 in volume) solution in order to achieve a high surface area with more electroactive sites. The Ni(OH){sub 2}/Al(OH){sub 4}{sup −} electrode was fabricated using potential cycling technique in a highly concentrated alkaline solution. The electrodes were tested electrochemically for oxidation of glucose. We have demonstrated that Ni(OH){sub 2}/Al(OH){sub 4}{sup −} electrodes exhibit high sensitivity towards glucose detection (796 μAmM{sup -1}cm{sup -2}) and short response time (3 s) upon successive addition of glucose. Moreover, as for a non-nanometric material, prepared electrodes show a relatively good linear correlation between current density and glucose concentration (0.025–0.45 mM) and limit of detection (47.6 μM). For more in-depth characterization of presented material, electrodes were examined using scanning electron microscopy (SEM) with energy-dispersive spectroscopy (EDS), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS).

  14. Investigation of Ni@CoO core-shell nanoparticle films synthesized by sequential layer deposition

    International Nuclear Information System (INIS)

    Spadaro, M.C.; Luches, P.; Benedetti, F.; Valeri, S.; Turchini, S.; Bertoni, G.; Ferretti, A.M.; Capetti, E.; Ponti, A.; D’Addato, S.

    2017-01-01

    Highlights: • We studied Ni/CoO core-shell nanoparticles (NP) obtained with a gas aggregation source. • The NP oxide shells were produced bye reactive deposition of Co in Oxygen atmosphere (p_O_2 ≈ 10"−"7 mbar). • XPS, SEM, STEM were used to obtain information on Ni chemical state and NP structure and morphology. • XMCD result showed evidence of remanent magnetization at room temperature. • We interpret XMCD results as due to stabilization induced by exchange bias due to AFM/FM coupling at the core/shell interface. - Abstract: Films of Ni@CoO core-shell nanoparticles (NP Ni core size d ≈ 11 nm) have been grown on Si/SiO_x and lacey carbon supports, by a sequential layer deposition method: a first layer of CoO was evaporated on the substrate, followed by the deposition of a layer of pre-formed, mass-selected Ni NPs, and finally an overlayer of CoO was added. The Ni NPs were formed by a magnetron gas aggregation source, and mass selected with a quadrupole mass filter. The morphology of the films was investigated with Scanning Electron Microscopy and Scanning Transmission Electron Microscopy. The Ni NP cores have a shape compatible with McKay icosahedron, caused by multitwinning occurring during their growth in the source, and the Ni NP layer shows the typical random paving growth mode. After the deposition of the CoO overlayer, CoO islands are observed, gradually extending and tending to merge with each other, with the formation of shells that enclose the Ni NP cores. In situ X-ray Photoelectron Spectroscopy showed that a few Ni atomic layers localized at the core-shell interface are oxidized, hinting at the possibility of creating an intermediate NiO shell between Ni and CoO, depending on the deposition conditions. Finally, X-ray Magnetic Circular Dichroism at the Ni L_2_,_3 absorption edge showed the presence of magnetization at room temperature even at remanence, revealing the possibility of magnetic stabilization of the NP film.

  15. A flexible, high-performance magnetoelectric heterostructure of (001) oriented Pb(Zr0.52Ti0.48)O3 film grown on Ni foil

    Science.gov (United States)

    Palneedi, Haribabu; Yeo, Hong Goo; Hwang, Geon-Tae; Annapureddy, Venkateswarlu; Kim, Jong-Woo; Choi, Jong-Jin; Trolier-McKinstry, Susan; Ryu, Jungho

    2017-09-01

    In this study, a flexible magnetoelectric (ME) heterostructure of PZT/Ni was fabricated by depositing a (001) oriented Pb(Zr0.52Ti0.48)O3 (PZT) film on a thin, flexible Ni foil buffered with LaNiO3/HfO2. Excellent ferroelectric properties and large ME voltage coefficient of 3.2 V/cmṡOe were realized from the PZT/Ni heterostructure. The PZT/Ni composite's high performance was attributed to strong texturing of the PZT film, coupled with the compressive stress in the piezoelectric film. Besides, reduced substrate clamping in the PZT film due to the film on the foil structure and strong interfacial bonding in the PZT/LaNiO3/HfO2/Ni heterostructure could also have contributed to the high ME performance of PZT/Ni.

  16. Double layer films based on TiO{sub 2} and NiO{sub x} for gas detection

    Energy Technology Data Exchange (ETDEWEB)

    Kosc, I., E-mail: ivan.kosc@stuba.sk [Institute of Electronics and Photonics, Slovak University of Technology, Bratislava (Slovakia); Hotovy, I. [Institute of Electronics and Photonics, Slovak University of Technology, Bratislava (Slovakia); Roch, T.; Plecenik, T.; Gregor, M. [Faculty of Mathematics, Physics and Informatics, Comenius University, Bratislava (Slovakia); Predanocy, M. [Institute of Electronics and Photonics, Slovak University of Technology, Bratislava (Slovakia); Cehlarova, M.; Kus, P.; Plecenik, A. [Faculty of Mathematics, Physics and Informatics, Comenius University, Bratislava (Slovakia)

    2014-09-01

    Highlights: • Double layer films based on TiO{sub 2} and NiO{sub x} for gas detection were studied. • Structural, compositional and morphological properties were investigated. • XPS spectra of TiO{sub 2} and NiO{sub x} were identified. • P- and n-type of response to hydrogen were presented. • Inversion of conductivity response type was confirmed. - Abstract: Double layer films based on TiO{sub 2} and NiO{sub x} for gas detection were studied. Two layouts with opposite position of functional films were deposited via DC magnetron sputtering method and annealed at 600 °C. The compositional, structural, morphological, electrical and gas sensing parameters were investigated. The depth profiles and the chemical state of the thin films elements were explored by X-ray photoelectron spectroscopy (XPS). Differences between the surface and subsurface NiO{sub x} were confirmed. In this way the formation of surface oxides and subsurface metallic Ni were observed. The structural changes and polycrystalline character were noticed by X-ray diffraction (XRD). The atomic force microscopy (AFM) revealed nanocrystalline character of the examined surfaces (both layouts). Different position of TiO{sub 2} and NiO{sub x} functional films brought difference in the type of response to reducing gas. Moreover, inversion of response type due to different H{sub 2} concentrations was confirmed.

  17. Room temperature magnetocaloric effect in Ni-Mn-In-Cr ferromagnetic shape memory alloy thin films

    Energy Technology Data Exchange (ETDEWEB)

    Akkera, Harish Sharma [Functionalnanomaterials Research Lab, Department of Physics, Indian Institute of Technology Roorkee, Uttarakhand-247667 (India); Singh, Inderdeep [Mechanical and Industrial Engineering Department, Indian Institute of Technology Roorkee, Uttarakhand-24667 (India); Kaur, Davinder, E-mail: dkaurfph@iitr.ernet.in [Functionalnanomaterials Research Lab, Department of Physics, Indian Institute of Technology Roorkee, Uttarakhand-247667 (India)

    2017-02-15

    The influence of Cr substitution for In on the martensitic phase transformation and magnetocaloric effect (MCE) has been investigated in Ni-Mn-Cr-In ferromagnetic shape memory alloy (FSMA) thin films fabricated by magnetron sputtering. Temperature dependent magnetization (M-T) measurements demonstrated that the martensitic transformation temperatures (T{sub M}) monotonously increase with the increase of Cr content due to change in valence electron concentration (e/a) and cell volume. From the study of isothermal magnetization curves (M-H), magnetocaloric effect around the martensitic transformation has been investigated in these FSMA thin films. The magnetic entropy change ∆S{sub M} of 7.0 mJ/cm{sup 3}-K was observed in Ni{sub 51.1}Mn{sub 34.9}In{sub 9.5}Cr{sub 4.5} film at 302 K in an applied field of 2 T. Further, the refrigerant capacity (RC) was also calculated for all the films in an applied field of 2 T. These findings indicate that the Cr doped Ni-Mn-In FSMA thin films are potential candidates for room temperature micro-length-scale magnetic refrigeration applications. - Highlights: • The Cr content leads to an increase in the martensitic transformation temperature. • The ∆S{sub M} =7 mJ/cm{sup 3}-K at 302 K was observed in the Ni{sub 51.1}Mn{sub 34.9}In{sub 9.5}Cr{sub 4.5}. • The RC =39.2 mJ/K at 2 T was obtained in Ni{sub 51.1}Mn{sub 34.9}In{sub 9.5}Cr{sub 4.5} film.

  18. Optimum Combination of Thermoplastic Formability and Electrical Conductivity in Al-Ni-Y Metallic Glass

    Science.gov (United States)

    Na, Min Young; Park, Sung Hyun; Kim, Kang Cheol; Kim, Won Tae; Kim, Do Hyang

    2018-05-01

    Both thermoplastic formability and electrical conductivity of Al-Ni-Y metallic glass with 12 different compositions have been investigated in the present study with an aim to apply as a functional material, i.e. as a binder of Ag powders in Ag paste for silicon solar cell. The thermoplastic formability is basically influenced by thermal stability and fragility of supercooled liquid which can be reflected by the temperature range for the supercooled liquid region (ΔT x ) and the difference in specific heat between the frozen glass state and the supercooled liquid state (ΔC p ). The measured ΔT x and ΔC p values show a strong composition dependence. However, the composition showing the highest ΔT x and ΔC p does not correspond to the composition with the highest amount of Ni and Y. It is considered that higher ΔT x and ΔC p may be related to enhancement of icosahedral SRO near T g during cooling. On the other hand, electrical resistivity varies with the change of Al contents as well as with the change of the volume fraction of each phase after crystallization. The composition range with the optimum combination of thermoplastic formability and electrical conductivity in Al-Ni-Y system located inside the composition triangle whose vertices compositions are Al87Ni3Y10, Al85Ni5Y10, and Al86Ni5Y9.

  19. Effects of annealing on the compositional heterogeneity and structure in zirconium-based bulk metallic glass thin films

    International Nuclear Information System (INIS)

    He, L.; Chu, J.P.; Li, C.-L.; Lee, C.-M.; Chen, Y.-C.; Liaw, P.K.; Voyles, P.M.

    2014-01-01

    In-situ heating fluctuation electron microscopy and scanning transmission electron microscopy have been utilized to study compositional and structural heterogeneities in Zr 51 Cu 32 Al 9 Ni 8 thin films upon annealing. Composition fluctuations are present in the as-deposited thin films. Well below the glass transition temperature, the composition fluctuations increase with annealing time. Short- and medium-range order also change with annealing temperature. The observed heterogeneities in the glass structure persist until annealing causes crystallization. The 20 nm thick Zr 51 Cu 32 Al 9 Ni 8 films contain oxide layers both at the surface and the film/substrate interface with the total thickness of 7–8 nm. In-situ annealing increased the oxygen content of the whole films to about 24 wt.% after 2 h at 400 °C. - Highlights: • Zr 51 Cu 32 Al 9 Ni 8 thin films were studied with in-situ heating electron microscopy. • Annealing at 400 °C increases the Zr and Cu compositional fluctuations. • Short-range order in Zr 51 Cu 32 Al 9 Ni 8 becomes less homogeneous above 350 °C. • Medium-range order changes in degree and types at 400 °C, well below T g . • Annealing increases composition and structure heterogeneities until crystallization

  20. Influence of Reactive Ion Etching on THz Transmission and Reflection Properties of NiCr Film Deposited on a Dielectric Substrate

    Directory of Open Access Journals (Sweden)

    Jun Gou

    2015-06-01

    Full Text Available Enhanced terahertz (THz absorption of NiCr film deposited on a dielectric substrate has been proven by applying a reactive ion etching (RIE treatment to the dielectric film. Nano – scale nickel – chromium (NiCr thin films are deposited on RIE treated silicon dioxide (SiO2 dielectric substrates to study the transmission and reflection characteristics. Experimental results suggest that both transmission and reflection of NiCr film are weakened by the RIE treatment. The most significant decrease of transmission is observed in 1 ~ 4 THz while that of reflection occurs in 1.7 ~ 2.5 THz band. The decrease of both transmission and reflection is more significant for NiCr film with higher thickness. The RIE treatment, which induces nano – scale surface structures and increases the effective surface area of NiCr film, enhances the absorption and weakens the transmission and reflection of THz radiation.DOI: http://dx.doi.org/10.5755/j01.ms.21.2.6131

  1. Ductility and fracture of single crystaliine Ni3Al with boron additions

    International Nuclear Information System (INIS)

    Heredia, F.E.; Pope, D.P.

    1989-01-01

    Low and high temperature tensile tests were performed on single crystals of pure Ni 3 Al and Ni 3 Al+B in order to determine the effect of B additions on the ductility and fracture behavior. Tests were carried out in air at a constant strain rate of 1/3 x 10 -3 s -1 . The orientation tested were [001] for whic the yield stress in tension is always greater than in compression, and those for wich the tension/compression asymmetry is zero ([T=C]) for each particular composition. At room temperature, the results show a positive effect of B additions on both the fracture stress and on the ductility. The ductility at 800K appears to decrease monotonically with B additions. The largest ductilities are found for [T=C] at room temperature where an improvement of about 26% (resolved strain) for an addition of 0.2 at % B was obtained. However, the most dramatic increase in ductility occurs for the [001] oriented samples at room temperature where a 55% improvement was measured over that of pure Ni 3 Al. Fracture surfaces show a combinaton of massive slip, some clevage, and heavily dimpled areas. These observations show that B additions not only increase the ductility of polycrystalline Ni 3 Al, as has been previously observed by many investigators, but also that the already-ductile single crystalline material, indicating that a bulk effect should be added to the grain boundary strengthening effect of B when explaining the improvement in ductility of polycrystalline Ni 3 Al due to B additions

  2. Pulsed laser deposited Al-doped ZnO thin films for optical applications

    Directory of Open Access Journals (Sweden)

    Gurpreet Kaur

    2015-02-01

    Full Text Available Highly transparent and conducting Al-doped ZnO (Al:ZnO thin films were grown on glass substrates using pulsed laser deposition technique. The profound effect of film thickness on the structural, optical and electrical properties of Al:ZnO thin films was observed. The X-ray diffraction depicts c-axis, plane (002 oriented thin films with hexagonal wurtzite crystal structure. Al-doping in ZnO introduces a compressive stress in the films which increase with the film thickness. AFM images reveal the columnar grain formation with low surface roughness. The versatile optical properties of Al:ZnO thin films are important for applications such as transparent electromagnetic interference (EMI shielding materials and solar cells. The obtained optical band gap (3.2–3.08 eV was found to be less than pure ZnO (3.37 eV films. The lowering in the band gap in Al:ZnO thin films could be attributed to band edge bending phenomena. The photoluminescence spectra gives sharp visible emission peaks, enables Al:ZnO thin films for light emitting devices (LEDs applications. The current–voltage (I–V measurements show the ohmic behavior of the films with resistivity (ρ~10−3 Ω cm.

  3. Comparison of reduction agents in the synthesis of infinite-layer LaNiO2 films

    International Nuclear Information System (INIS)

    Ikeda, Ai; Manabe, Takaaki; Naito, Michio

    2014-01-01

    Highlights: • Reduction agents were compared from a viewpoint of the facility for topotactic reduction of LaNiO 3 to LaNiO 2 films. • TiH 2 and CaH 2 yielded infinite-layer LaNiO 2 with low and metallic resistivity. • H 2 released from metal hydrides plays a dominant role in the topotactic reduction. - Abstract: Reduction agents, such as activated carbon, TiH 2 , and CaH 2 , were compared from a viewpoint of the facility for the topotactic reduction of LaNiO 3 to LaNiO 2 films. Activated carbon did not yield infinite-layer LaNiO 2 whereas both of TiH 2 and CaH 2 yielded infinite-layer LaNiO 2 with low resistivity (∼1 mΩ cm at 300 K) as well as metallic behavior down to 70 K. Thermal desorption spectroscopy indicated that H 2 released from metal hydrides plays a dominant role in the topotactic reduction

  4. Study of the Ni-NiAl{sub 2}O{sub 4}-YSZ cermet for its possible application as an anode in solid oxide fuel cells

    Energy Technology Data Exchange (ETDEWEB)

    Reyes-Rojas, A [Centro de Investigacion en Materiales Avanzados SC, Miguel de Cervantes 120, Complejo Industrial Chihuahua, Chihuahua (Mexico); Universidad Autonoma del Estado de Mexico, Facultad de Quimica, Toluca (Mexico); Esparza-Ponce, H E [Centro de Investigacion en Materiales Avanzados SC, Miguel de Cervantes 120, Complejo Industrial Chihuahua, Chihuahua (Mexico); Reyes-Gasga, J [Universidad Nacional Autonoma de Mexico, Instituto de Fisica, Mexico DF (Mexico)

    2006-05-17

    Nanocrystalline Ni-NiAl{sub 2}O{sub 4}-YSZ cermet with a possible application as anode in solid oxide fuel cells (SOFCs) has been developed. The powders were prepared by using an alternative solid-state method that includes the use of nickel acetylacetonate as an inorganic precursor to obtain a highly porous material after sintering at 1400 {sup o}C and oxide reduction (NiO -Al{sub 2}O{sub 3}-YSZ {yields} Ni-NiAl{sub 2}O{sub 4}-YSZ) at 800 {sup o}C for 8 h in a tubular reactor furnace using 10% H{sub 2}/N{sub 2}. Eight samples with 45% Ni and 55% Al{sub 2}O{sub 3}-YSZ in concentrations of Al{sub 2}O{sub 3} oxides from 10 to 80 wt% of were mixed to obtain the cermets. The obtained material was compressed using unidirectional axial pressing and calcinations from room temperature to 800 {sup o}C. Good results were registered using a heating rate of 1 {sup o}C min{sup -1} and a special ramp to avoid anode cracking. Thermal expansion, electrical conductivity, and structural characterization by thermo-mechanical analyser (TMA) techniques/methods, the four-point probe method for conductivity, scanning electron microscopy (SEM), x-ray energy dispersive spectroscopy (EDS), x-ray diffraction (XRD), and the Rietveld method were carried out. Cermets in the range 5.5 to 11% Al{sub 2}O{sub 3} present a crystal size around 200 nm. An inversion degree (I) in the NiAl{sub 2}O{sub 4} spinel structure of the cermets Ni-NiAl{sub 2}O{sub 4}-YSZ was found after the sintering and reduction processes. Good electrical conductivity and thermal expansion coefficient were obtained for the cermet with 12 wt% of spinel structure formation.

  5. Research on microstructure properties of the TiC/Ni-Fe-Al coating prepared by laser cladding technology

    Science.gov (United States)

    Jiao, Junke; Xu, Zifa; Zan, Shaoping; Zhang, Wenwu; Sheng, Liyuan

    2017-10-01

    In this paper, the laser cladding method was used to preparation the TiC reinforced Ni-Fe-Al coating on the Ni base superalloy. The Ti/Ni-Fe-Al powder was preset on the Ni base superalloy and the powder layer thickness is 0.5mm. A fiber laser was used the melting Ti/Ni-Fe-Al powder in an inert gas environment. The shape of the cladding layer was tested using laser scanning confocal microscope (LSCM) under different cladding parameters such as the laser power, the melting velocity and the defocused amount. The microstructure, the micro-hardness was tested by LSCM, SEM, Vickers hardness tester. The test result showed that the TiC particles was distributed uniformly in the cladding layer and hardness of the cladding layer was improved from 180HV to 320HV compared with the Ni-Fe-Al cladding layer without TiC powder reinforced, and a metallurgical bonding was produced between the cladding layer and the base metal. The TiC powder could make the Ni-Fe-Al cladding layer grain refining, and the more TiC powder added in the Ni-Fe-Al powder, the smaller grain size was in the cladding layer.

  6. Adhesion strength of Ni film on Ti substrate characterized by three-point bend test, peel test and theoretic calculation

    International Nuclear Information System (INIS)

    Ren, F.Z.; Liu, P.; Jia, S.G.; Tian, B.H.; Su, J.H.

    2006-01-01

    Electroplating was employed to fabricate the Ni film on the Ti substrate. Adhesion strength of Ni film on Ti substrate was determined using the three-point bend technique that was proposed in standard mechanics test. The experimental results demonstrate that the interface fracture energies obviously increase with the roughness of Ti substrates, and are independence with the thickness of Ni films. Moreover, the adhesion strength of Ni film on Ti substrate was also measured by peel test, and was evaluated by Miedema model of experiential electron theory. The intrinsic interface fracture energy measured by three-point bend test is reasonable agreement with that obtained by theoretical calculation of Miedema model, and is roughly comparable to that by peel test

  7. Effect of electric pulse modification on mircostructure and properties of Ni-rich Al-Si piston alloy

    Directory of Open Access Journals (Sweden)

    Bing Wang

    2016-03-01

    Full Text Available In order to improve the properties of Ni-rich (2.5wt.% Al-Si piston alloy, electric pulse modification was applied in fabricating the Ni-rich Al-Si piston alloy in this study. The effect of electric pulse modification on the mechanical properties of the Ni-rich Al-Si piston alloy was studied using optical microscope (OM, scanning electron microscope (SEM, X-ray diffraction (XRD, microhardness measurement and tensile strength testing. The results showed that the microstructures of Ni-rich Al-Si piston alloy treated by electric pulse modification were refined, the solid solubility of Cu, Ni, Si, etc. in α-Al matrix was improved, and furthermore, the microhardness and high-temperature tensile strength were increased by 9.41% and 17.5%, respectively. The distribution of second phases was also more uniform compared with that of a non-modified sample.

  8. Electrochemical investigation of electrochromic devices based on NiO and WO3 films using different lithium salts electrolytes

    International Nuclear Information System (INIS)

    Wei, Youxiu; Chen, Mu; Liu, Weiming; Li, Lei; Yan, Yue

    2017-01-01

    Highlights: •ECDs based on NiO and WO 3 films using different electrolytes were fabricated. •Effect of different electrolytes on films and ECDs was investigated. •Applied voltage distribution on NiO and WO 3 electrodes in an ECD was studied. •Voltage distribution on films was unbalanced and associated with electrolyte. •Films have different impedance behavior in different states and electrolytes. -- Abstract: Electrochromic devices (ECDs) with different liquid electrolytes were fabricated using NiO film as counter electrode, WO 3 film as working electrode. The effect of liquid electrolytes containing different lithium salts (LiClO 4 , LiPF 6 , LiTFSI) on films and ECDs was investigated, such as transmittance change, charge density, memory effect and cyclic stability. Films or ECDs using LiPF 6 electrolyte have excellent electrochromic properties but low cyclic stability, compared with LiClO 4 and LiTFSI electrolytes. In order to deeply understand the effect of electrolyte on films and devices, the voltage distribution of films based on an analog cell and electrochemical impedance spectroscopy (EIS) were measured and analyzed in different lithium salts electrolytes. Results show that voltage distribution and EIS characteristics of films have obvious difference in liquid LiClO 4 , LiPF 6 and LiTFSI electrolytes. Voltage distribution on NiO and WO 3 films is unbalanced and the impedance of films in bleached and colored states is different in the same electrolyte.

  9. Structural features of epitaxial NiFe2O4 thin films grown on different substrates by direct liquid injection chemical vapor deposition

    Science.gov (United States)

    Datta, R.; Loukya, B.; Li, N.; Gupta, A.

    2012-04-01

    NiFe2O4 (NFO) thin films are grown on four different substrates, i.e., Lead Zinc Niobate-Lead Titanate (PZN-PT), Lead Magnesium Niobate-Lead Titanate (PMN-PT), MgAl2O4 (MAO) and SrTiO3 (STO), by a direct liquid injection chemical vapor deposition technique (DLI-CVD) under optimum growth conditions where relatively high growth rate (˜20 nm/min), smooth surface morphology and high saturation magnetization values in the range of 260-290 emu/ cm3 are obtained. The NFO films with correct stoichiometry (Ni:Fe=1:2) grow epitaxially on all four substrates, as confirmed by energy dispersive X-ray spectroscopy, transmission electron microscopy and x-ray diffraction. While the films on PMN-PT and PZN-PT substrates are partially strained, essentially complete strain relaxation occurs for films grown on MAO and STO. The formations of threading dislocations along with dark diffused contrast areas related to antiphase domains having a different cation ordering are observed on all four substrates. These crystal defects are correlated with lattice mismatch between the film