Stresa, Italy, 25-27 April 2007 PROFILE CONTROL OF A BOROSILICATE ...
The selectivity of the mask, e.g., poly-silicon, tungsten silicide, and chromium, is around 20. This means that the necessary thickness of the mask film is ...
Profile Control of a Borosilicate-Glass Groove Formed by Deep ...
de T Akashi - 2007 - Autres articlespoly-silicon, tungsten silicide, and chromium, is around. 20. This means that the necessary thickness of the mask film is calculated as 15 μm when a ...