Stresa, Italy, 25-27 April 2007 PROFILE CONTROL OF A BOROSILICATE ...
In the process, carbon-fluoride gases, i.e., C 4 F 8 and CHF 3 ... This was due to thick polymer film produced by carbon-fluoride plasma during DRIE. ...
Profile Control of a Borosilicate-Glass Groove Formed by Deep ...
de T Akashi - 2007 - Autres articlesargon added to carbon-fluoride etching gases, i.e., C4F8 .... with the carbon-fluoride gases caused a fairly large difference between the mask opening and ...
films of one piezoelectric, known as polyvinylidene fluoride, have already ..... carbon dioxide from the air of a greenhouse-heated planet and "metab- ...