Sample records for DISPOSITIVOS DE CONFIGURACION CERRADA (closed plasma devices)
from WorldWideScience.org

Sample records 1 - 2 shown.



1

Remote plasma chemical vapor deposition silicon oxynitride thin films: Dielectric properties

Hernández Vélez, M.; Sánchez Garrido, Olga; Fernández Gutiérrez, F.; Falcony, C.; Martínez Duart, J. M.
1998-05-01

Digital.CSIC (Spain)