Ultra thin Al2O3 and HfO2 films (UP to similar to6 nm) were deposited on SiO2/Si wafers by atomic layer chemical vapour deposition (ALCVD(TM,1)) and studied by exsitu X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry (SE). The thickness of these high-k layers (including the thick...
Thin films : proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994]
Proceedings of the Symposium on Electrochemically Deposited Thin Films : [papers presented at the Symposium on Electrochemically Deposited Thin Films held during the Spring 1993 Meeting of the Electrochemical Society, Honolulu, Hawaii]
Nanostructured thin films and nanodispersion strengthened coatings : [proceedings of the NATO Advanced Research Workshop on Nanostructured Thin Films and Nanodispersion Strengthened Coatings, Moscow, Russia, 8 - 10 December 2003]
Ferroic materials : design, preparation, and characteristics ; [proceedings of the International Symposium on Ferroelectric Thin Films, the International Symposium on Materials for Intelligent/Smart Systems and Adaptive Structures, and the Processing of Thin Films Symposium, presented at the PAC RIM Meeting, held in Honolulu, HI, November 7-10, 1993]