Sample records for ZYKLOTRON CHICAGO (chicago cyclotron)
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23

Profile and Morphology Control During Etching of SiC Using Electron Cyclotron Resonant (ECR) Plasmas

Flemish, J. R.; The Electrochemical Society; Electronics, Dielectric Science and Technology, and Luminescence and Siplay Materials Division
1995-01-01

German National Library of Science and Technology (GetInfo) (German)

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