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Sample records for microwave plasma nitriding

  1. Microstructure and antibacterial properties of microwave plasma nitrided layers on biomedical stainless steels

    International Nuclear Information System (INIS)

    Lin, Li-Hsiang; Chen, Shih-Chung; Wu, Ching-Zong; Hung, Jing-Ming; Ou, Keng-Liang

    2011-01-01

    Nitriding of AISI 303 austenitic stainless steel using microwave plasma system at various temperatures was conducted in the present study. The nitrided layers were characterized via scanning electron microscopy, glancing angle X-ray diffraction, transmission electron microscopy and Vickers microhardness tester. The antibacterial properties of this nitrided layer were evaluated. During nitriding treatment between 350 deg. C and 550 deg. C, the phase transformation sequence on the nitrided layers of the alloys was found to be γ → (γ + γ N ) → (γ + α + CrN). The analytical results revealed that the surface hardness of AISI 303 stainless steel could be enhanced with the formation of γ N phase in nitriding process. Antibacterial test also demonstrated the nitrided layer processed the excellent antibacterial properties. The enhanced surface hardness and antibacterial properties make the nitrided AISI 303 austenitic stainless steel to be one of the essential materials in the biomedical applications.

  2. Structure and properties of the Stainless steel AISI 316 nitrided with microwave plasma

    International Nuclear Information System (INIS)

    Becerril R, F.

    1999-01-01

    In this work were presented the results obtained by nitridation on stainless steel AISI 316 using a plasma generated through a microwave discharge with an external magnetic field using several moistures hydrogen / nitrogen to form a plasma. The purpose of nitridation was to increase the surface hardness of stainless steel through a phase formation knew as γN which has been reported that produces such effect without affect the corrosion resistance proper of this material. (Author)

  3. On the intrinsic moisture permeation rate of remote microwave plasma-deposited silicon nitride layers

    NARCIS (Netherlands)

    van Assche, F. J. H.; Unnikrishnan, S.; Michels, J. J.; van Mol, A. M. B.; van de Weijer, P.; M. C. M. van de Sanden,; Creatore, M.

    2014-01-01

    We report on a low substrate temperature (110 °C) remote microwave plasma-enhanced chemical vapor deposition (PECVD) process of silicon nitride barrier layers against moisture permeation for organic light emitting diodes (OLEDs) and other moisture sensitive devices such as organic

  4. Treatment of nitridation by microwave post discharge plasma in an AISI 4140 steel

    International Nuclear Information System (INIS)

    Medina F, A.; Rodriguez L, V.; Zamora R, L.; Oseguera P, J.

    1998-01-01

    The objective of this work is to determine through X-ray diffraction, microhardness measurement and scanning electron microscopy those main operation parameters of the microwave post discharge treatment (temperature of treatment, gas mixture and permanence time) nitriding an AISI 4140 steel and to characterize the compact layer of nitrides formed during the treatment. (Author)

  5. Structure and properties of the Stainless steel AISI 316 nitrided with microwave plasma; Estructura y propiedades del acero inoxidable AISI 316 nitrurado con plasmas de microondas

    Energy Technology Data Exchange (ETDEWEB)

    Becerril R, F

    1999-07-01

    In this work were presented the results obtained by nitridation on stainless steel AISI 316 using a plasma generated through a microwave discharge with an external magnetic field using several moistures hydrogen / nitrogen to form a plasma. The purpose of nitridation was to increase the surface hardness of stainless steel through a phase formation knew as {gamma}N which has been reported that produces such effect without affect the corrosion resistance proper of this material. (Author)

  6. Plasma nitriding of steels

    CERN Document Server

    Aghajani, Hossein

    2017-01-01

    This book focuses on the effect of plasma nitriding on the properties of steels. Parameters of different grades of steels are considered, such as structural and constructional steels, stainless steels and tools steels. The reader will find within the text an introduction to nitriding treatment, the basis of plasma and its roll in nitriding. The authors also address the advantages and disadvantages of plasma nitriding in comparison with other nitriding methods. .

  7. Influence of the density of the microwave plasma in the nitridation of the AISI 4140 steel

    International Nuclear Information System (INIS)

    Chirino O, S.; Camps C, E.; Escobar A, L.; Mejia H, J.A.

    2004-01-01

    A source of microwaves plasma type ECR was used to modify those mechanical properties of the surface of steel pieces AISI 4140. The experiments were carried out in a range of pressure among 4 X 10 -4 and 7 X 10 -4 Torr using one mixture of gases 60/40 hydrogen / nitrogen and an incident power of the microwaves of 400 W. Previous to the treatment of the samples, the plasma was studied using one Langmuir probe to determine the temperature of the electrons and the density of the plasma, the species excited in the plasma were determined by means of Optical emission spectroscopy. All the samples were treated during 50 min in a regime of low temperature (- 250 C), and the surface hardness it was increased up of 100% of their initial value, with a depth of penetration of the nitrogen of 4.5 μ m. The biggest hardness and depth of penetration of the nitrogen were obtained when the biggest density in the plasma was used to carry out the experiments. (Author)

  8. Plasma relativistic microwave electronics

    International Nuclear Information System (INIS)

    Kuzelev, M.V.; Loza, O.T.; Rukhadze, A.A.; Strelkov, P.S.; Shkvarunets, A.G.

    2001-01-01

    One formulated the principles of plasma relativistic microwave electronics based on the induced Cherenkov radiation of electromagnetic waves at interaction of a relativistic electron beam with plasma. One developed the theory of plasma relativistic generators and accelerators of microwave radiation, designed and studied the prototypes of such devices. One studied theoretically the mechanisms of radiation, calculated the efficiencies and the frequency spectra of plasma relativistic microwave generators and accelerators. The theory findings are proved by the experiment: intensity of the designed sources of microwave radiation is equal to 500 μW, the frequency of microwave radiation is increased by 7 times (from 4 up to 28 GHz), the width of radiation frequency band may vary from several up to 100%. The designed sources of microwave radiation are no else compared in the electronics [ru

  9. Treatment of nitridation by microwave post discharge plasma in an AISI 4140 steel; Tratamiento de nitruracion por plasma post-descarga micro-ondas en un acero AISI 4140

    Energy Technology Data Exchange (ETDEWEB)

    Medina F, A. [Instituto Tecnologico de Morelia, Morelia e Instituto Nacional de Investigaciones Nucleares, A.P. 18-1027, 11801 Mexico D.F. (Mexico); Rodriguez L, V.; Zamora R, L. [ININ, Mexico D.F. (Mexico); Oseguera P, J

    1998-07-01

    The objective of this work is to determine through X-ray diffraction, microhardness measurement and scanning electron microscopy those main operation parameters of the microwave post discharge treatment (temperature of treatment, gas mixture and permanence time) nitriding an AISI 4140 steel and to characterize the compact layer of nitrides formed during the treatment. (Author)

  10. Surface modification of titanium by plasma nitriding

    Directory of Open Access Journals (Sweden)

    Kapczinski Myriam Pereira

    2003-01-01

    Full Text Available A systematic investigation was undertaken on commercially pure titanium submitted to plasma nitriding. Thirteen different sets of operational parameters (nitriding time, sample temperature and plasma atmosphere were used. Surface analyses were performed using X-ray diffraction, nuclear reaction and scanning electron microscopy. Wear tests were done with stainless steel Gracey scaler, sonic apparatus and pin-on-disc machine. The obtained results indicate that the tribological performance can be improved for samples treated with the following conditions: nitriding time of 3 h; plasma atmosphere consisting of 80%N2+20%H2 or 20%N2+80%H2; sample temperature during nitriding of 600 or 800 degreesC.

  11. Plasma nitridation optimization for sub-15 A gate dielectrics

    NARCIS (Netherlands)

    Cubaynes, F.N; Schmitz, Jurriaan; van der Marel, C.; Snijders, J.H.M.; Veloso, A.; Rothschild, A.; Olsen, C.; Date, L.

    The work investigates the impact of plasma nitridation process parameters upon the physical properties and upon the electrical performance of sub-15 A plasma nitrided gate dielectrics. The nitrogen distribution and chemical bonding of ultra-thin plasma nitrided films have been investigated using

  12. Metal surface nitriding by laser induced plasma

    Science.gov (United States)

    Thomann, A. L.; Boulmer-Leborgne, C.; Andreazza-Vignolle, C.; Andreazza, P.; Hermann, J.; Blondiaux, G.

    1996-10-01

    We study a nitriding technique of metals by means of laser induced plasma. The synthesized layers are composed of a nitrogen concentration gradient over several μm depth, and are expected to be useful for tribological applications with no adhesion problem. The nitriding method is tested on the synthesis of titanium nitride which is a well-known compound, obtained at present by many deposition and diffusion techniques. In the method of interest, a laser beam is focused on a titanium target in a nitrogen atmosphere, leading to the creation of a plasma over the metal surface. In order to understand the layer formation, it is necessary to characterize the plasma as well as the surface that it has been in contact with. Progressive nitrogen incorporation in the titanium lattice and TiN synthesis are studied by characterizing samples prepared with increasing laser shot number (100-4000). The role of the laser wavelength is also inspected by comparing layers obtained with two kinds of pulsed lasers: a transversal-excited-atmospheric-pressure-CO2 laser (λ=10.6 μm) and a XeCl excimer laser (λ=308 nm). Simulations of the target temperature rise under laser irradiation are performed, which evidence differences in the initial laser/material interaction (material heated thickness, heating time duration, etc.) depending on the laser features (wavelength and pulse time duration). Results from plasma characterization also point out that the plasma composition and propagation mode depend on the laser wavelength. Correlation of these results with those obtained from layer analyses shows at first the important role played by the plasma in the nitrogen incorporation. Its presence is necessary and allows N2 dissociation and a better energy coupling with the target. Second, it appears that the nitrogen diffusion governs the nitriding process. The study of the metal nitriding efficiency, depending on the laser used, allows us to explain the differences observed in the layer features

  13. Development of microwave amplifier based on gallium nitride semiconductor structures

    International Nuclear Information System (INIS)

    Pavlov, D.Yi.; Prokopenko, O.V.; Tsvyirko, Yu.A.; Pavlov, Yi.L.

    2014-01-01

    Microwave properties of microwave amplifier based on gallium nitride (GN) semiconductor structures has been calculated numerically. We proposed the method of numerical calculation of device. This method is accurately sets the value of its characteristics depending on the elements that are used in design of amplifier. It is shown that the device based on GN HEMT-transistors could have amplification factor about 50 dB, while its sizes are 27x18x5.5 mm 3 . Also was provided the absolute stability an amplifier in the whole operating frequency range. It is quite important when using this type of amplifiers in different conditions of exploitation and various fields of use the radioelectronic equipment

  14. Influence of the density of the microwave plasma in the nitridation of the AISI 4140 steel; Influencia de la densidad del plasma de microondas en la nitruracion de acero AISI 4140

    Energy Technology Data Exchange (ETDEWEB)

    Chirino O, S.; Camps C, E.; Escobar A, L.; Mejia H, J.A. [ININ, 52045 Ocoyoacac, Estado de Mexico (Mexico)

    2004-07-01

    A source of microwaves plasma type ECR was used to modify those mechanical properties of the surface of steel pieces AISI 4140. The experiments were carried out in a range of pressure among 4 X 10{sup -4} and 7 X 10{sup -4} Torr using one mixture of gases 60/40 hydrogen / nitrogen and an incident power of the microwaves of 400 W. Previous to the treatment of the samples, the plasma was studied using one Langmuir probe to determine the temperature of the electrons and the density of the plasma, the species excited in the plasma were determined by means of Optical emission spectroscopy. All the samples were treated during 50 min in a regime of low temperature (- 250 C), and the surface hardness it was increased up of 100% of their initial value, with a depth of penetration of the nitrogen of 4.5 {mu} m. The biggest hardness and depth of penetration of the nitrogen were obtained when the biggest density in the plasma was used to carry out the experiments. (Author)

  15. Radiofrequency cold plasma nitrided carbon steel: Microstructural and micromechanical characterizations

    International Nuclear Information System (INIS)

    Bouanis, F.Z.; Bentiss, F.; Bellayer, S.; Vogt, J.B.; Jama, C.

    2011-01-01

    Highlights: → C38 carbon steel samples were plasma nitrided using a radiofrequency (rf) nitrogen plasma discharge. → RF plasma treatment enables nitriding for non-heated substrates. → The morphological and chemical analyses show the formation of a uniform thickness on the surface of the nitrided C38 steel. → Nitrogen plasma active species diffuse into the samples and lead to the formation of Fe x N. → The increase in microhardness values for nitrided samples with plasma processing time is interpreted by the formation of a thicker nitrided layer on the steel surface. - Abstract: In this work, C38 carbon steel was plasma nitrided using a radiofrequency (rf) nitrogen plasma discharge on non-heated substrates. General characterizations were performed to compare the chemical compositions, the microstructures and hardness of the untreated and plasma treated surfaces. The plasma nitriding was carried out on non-heated substrates at a pressure of 16.8 Pa, using N 2 gas. Surface characterizations before and after N 2 plasma treatment were performed by means of the electron probe microanalysis (EPMA), X-ray photoelectron spectroscopy (XPS) and Vickers microhardness measurements. The morphological and chemical analysis showed the formation of a uniform structure on the surface of the nitrided sample with enrichment in nitrogen when compared to untreated sample. The thickness of the nitride layer formed depends on the treatment time duration and is approximately 14 μm for 10 h of plasma treatment. XPS was employed to obtain chemical-state information of the plasma nitrided steel surfaces. The micromechanical results show that the surface microhardness increases as the plasma-processing time increases to reach, 1487 HV 0.005 at a plasma processing time of 8 h.

  16. Radiofrequency cold plasma nitrided carbon steel: Microstructural and micromechanical characterizations

    Energy Technology Data Exchange (ETDEWEB)

    Bouanis, F.Z. [Universite Lille Nord de France, F-59000 Lille (France); Unite Materiaux et Transformations (UMET), Ingenierie des Systemes Polymeres, CNRS UMR 8207, ENSCL, BP 90108, F-59652 Villeneuve d' Ascq Cedex (France); Bentiss, F. [Laboratoire de Chimie de Coordination et d' Analytique, Faculte des Sciences, Universite Chouaib Doukkali, B.P. 20, M-24000 El Jadida (Morocco); Bellayer, S.; Vogt, J.B. [Universite Lille Nord de France, F-59000 Lille (France); Unite Materiaux et Transformations (UMET), Ingenierie des Systemes Polymeres, CNRS UMR 8207, ENSCL, BP 90108, F-59652 Villeneuve d' Ascq Cedex (France); Jama, C., E-mail: charafeddine.jama@ensc-lille.fr [Universite Lille Nord de France, F-59000 Lille (France); Unite Materiaux et Transformations (UMET), Ingenierie des Systemes Polymeres, CNRS UMR 8207, ENSCL, BP 90108, F-59652 Villeneuve d' Ascq Cedex (France)

    2011-05-16

    Highlights: {yields} C38 carbon steel samples were plasma nitrided using a radiofrequency (rf) nitrogen plasma discharge. {yields} RF plasma treatment enables nitriding for non-heated substrates. {yields} The morphological and chemical analyses show the formation of a uniform thickness on the surface of the nitrided C38 steel. {yields} Nitrogen plasma active species diffuse into the samples and lead to the formation of Fe{sub x}N. {yields} The increase in microhardness values for nitrided samples with plasma processing time is interpreted by the formation of a thicker nitrided layer on the steel surface. - Abstract: In this work, C38 carbon steel was plasma nitrided using a radiofrequency (rf) nitrogen plasma discharge on non-heated substrates. General characterizations were performed to compare the chemical compositions, the microstructures and hardness of the untreated and plasma treated surfaces. The plasma nitriding was carried out on non-heated substrates at a pressure of 16.8 Pa, using N{sub 2} gas. Surface characterizations before and after N{sub 2} plasma treatment were performed by means of the electron probe microanalysis (EPMA), X-ray photoelectron spectroscopy (XPS) and Vickers microhardness measurements. The morphological and chemical analysis showed the formation of a uniform structure on the surface of the nitrided sample with enrichment in nitrogen when compared to untreated sample. The thickness of the nitride layer formed depends on the treatment time duration and is approximately 14 {mu}m for 10 h of plasma treatment. XPS was employed to obtain chemical-state information of the plasma nitrided steel surfaces. The micromechanical results show that the surface microhardness increases as the plasma-processing time increases to reach, 1487 HV{sub 0.005} at a plasma processing time of 8 h.

  17. Interactions of microwave with plasmas

    International Nuclear Information System (INIS)

    Zhang Haifeng; Shao Fuqiu; Wang Long

    2003-01-01

    When plasma size scale is comparable with the wavelength of electromagnetic waves, W.K.B. solution isn't applicable. In this paper a new numerical solution technique to investigate interactions of microwave with plasmas is presented by using Runge-Kutta method. The results of numerical solution coincide with that of analytical solution while the model is linear electron density profile in calculated accuracy

  18. Converting a Microwave Oven into a Plasma Reactor: A Review

    Directory of Open Access Journals (Sweden)

    Victor J. Law

    2018-01-01

    Full Text Available This paper reviews the use of domestic microwave ovens as plasma reactors for applications ranging from surface cleaning to pyrolysis and chemical synthesis. This review traces the developments from initial reports in the 1980s to today’s converted ovens that are used in proof-of-principle manufacture of carbon nanostructures and batch cleaning of ion implant ceramics. Information sources include the US and Korean patent office, peer-reviewed papers, and web references. It is shown that the microwave oven plasma can induce rapid heterogeneous reaction (solid to gas and liquid to gas/solid plus the much slower plasma-induced solid state reaction (metal oxide to metal nitride. A particular focus of this review is the passive and active nature of wire aerial electrodes, igniters, and thermal/chemical plasma catalyst in the generation of atmospheric plasma. In addition to the development of the microwave oven plasma, a further aspect evaluated is the development of methodologies for calibrating the plasma reactors with respect to microwave leakage, calorimetry, surface temperature, DUV-UV content, and plasma ion densities.

  19. Microwave plasma mode conversion

    International Nuclear Information System (INIS)

    Torres, H.S.; Sakanaka, P.H.; Villarroel, C.H.

    1985-01-01

    The behavior of hot electrons during the process of laser-produced plasma is studied. The basic equations of mode conversion from electromagnetic waves to electrostatic waves are presented. It is shown by mode conversion, that, the resonant absorption and parametric instabilities appear simultaneously, but in different plasma regions. (M.C.K.) [pt

  20. Microwave Plasma System: PVA Tepla 300

    Data.gov (United States)

    Federal Laboratory Consortium — Description:CORAL Name: Microwave AsherA tool using microwave oxygen plasma to remove organics on the surfacesSpecifications / Capabilities:Frequency: 2.45 GHzPower:...

  1. Plasma nitriding monitoring reactor: A model reactor for studying plasma nitriding processes using an active screen

    Science.gov (United States)

    Hamann, S.; Börner, K.; Burlacov, I.; Spies, H.-J.; Strämke, M.; Strämke, S.; Röpcke, J.

    2015-12-01

    A laboratory scale plasma nitriding monitoring reactor (PLANIMOR) has been designed to study the basics of active screen plasma nitriding (ASPN) processes. PLANIMOR consists of a tube reactor vessel, made of borosilicate glass, enabling optical emission spectroscopy (OES) and infrared absorption spectroscopy. The linear setup of the electrode system of the reactor has the advantages to apply the diagnostic approaches on each part of the plasma process, separately. Furthermore, possible changes of the electrical field and of the heat generation, as they could appear in down-scaled cylindrical ASPN reactors, are avoided. PLANIMOR has been used for the nitriding of steel samples, achieving similar results as in an industrial scale ASPN reactor. A compact spectrometer using an external cavity quantum cascade laser combined with an optical multi-pass cell has been applied for the detection of molecular reaction products. This allowed the determination of the concentrations of four stable molecular species (CH4, C2H2, HCN, and NH3). With the help of OES, the rotational temperature of the screen plasma could be determined.

  2. Plasma nitriding monitoring reactor: A model reactor for studying plasma nitriding processes using an active screen

    International Nuclear Information System (INIS)

    Hamann, S.; Röpcke, J.; Börner, K.; Burlacov, I.; Spies, H.-J.; Strämke, M.; Strämke, S.

    2015-01-01

    A laboratory scale plasma nitriding monitoring reactor (PLANIMOR) has been designed to study the basics of active screen plasma nitriding (ASPN) processes. PLANIMOR consists of a tube reactor vessel, made of borosilicate glass, enabling optical emission spectroscopy (OES) and infrared absorption spectroscopy. The linear setup of the electrode system of the reactor has the advantages to apply the diagnostic approaches on each part of the plasma process, separately. Furthermore, possible changes of the electrical field and of the heat generation, as they could appear in down-scaled cylindrical ASPN reactors, are avoided. PLANIMOR has been used for the nitriding of steel samples, achieving similar results as in an industrial scale ASPN reactor. A compact spectrometer using an external cavity quantum cascade laser combined with an optical multi-pass cell has been applied for the detection of molecular reaction products. This allowed the determination of the concentrations of four stable molecular species (CH 4 , C 2 H 2 , HCN, and NH 3 ). With the help of OES, the rotational temperature of the screen plasma could be determined

  3. Plasma nitriding monitoring reactor: A model reactor for studying plasma nitriding processes using an active screen

    Energy Technology Data Exchange (ETDEWEB)

    Hamann, S., E-mail: hamann@inp-greifswald.de; Röpcke, J. [INP-Greifswald, Felix-Hausdorff-Str. 2, 17489 Greifswald (Germany); Börner, K.; Burlacov, I.; Spies, H.-J. [TU Bergakademie Freiberg, Institute of Materials Engineering, Gustav-Zeuner-Str. 5, 09599 Freiberg (Germany); Strämke, M.; Strämke, S. [ELTRO GmbH, Arnold-Sommerfeld-Ring 3, 52499 Baesweiler (Germany)

    2015-12-15

    A laboratory scale plasma nitriding monitoring reactor (PLANIMOR) has been designed to study the basics of active screen plasma nitriding (ASPN) processes. PLANIMOR consists of a tube reactor vessel, made of borosilicate glass, enabling optical emission spectroscopy (OES) and infrared absorption spectroscopy. The linear setup of the electrode system of the reactor has the advantages to apply the diagnostic approaches on each part of the plasma process, separately. Furthermore, possible changes of the electrical field and of the heat generation, as they could appear in down-scaled cylindrical ASPN reactors, are avoided. PLANIMOR has been used for the nitriding of steel samples, achieving similar results as in an industrial scale ASPN reactor. A compact spectrometer using an external cavity quantum cascade laser combined with an optical multi-pass cell has been applied for the detection of molecular reaction products. This allowed the determination of the concentrations of four stable molecular species (CH{sub 4}, C{sub 2}H{sub 2}, HCN, and NH{sub 3}). With the help of OES, the rotational temperature of the screen plasma could be determined.

  4. Plasma nitriding - an eco friendly surface hardening process

    International Nuclear Information System (INIS)

    Mukherjee, S.

    2015-01-01

    Surface hardening is a process of heating the metal such that the surface gets only hardened. This process is adopted for many components like gears, cams, and crankshafts, which desire high hardness on the outer surface with a softer core to withstand the shocks. So, to attain such properties processes like carburising, nitriding, flame hardening and induction hardening are employed. Amongst these processes nitriding is the most commonly used process by many industries. In nitriding process the steel material is heated to a temperature of around 550 C and then exposed to atomic nitrogen. This atomic nitrogen reacts with iron and other alloying elements and forms nitrides, which are very hard in nature. By this process both wear resistance and hardness of the product can be increased. The atomic nitrogen required for this process can be obtained using ammonia gas (gas nitriding), cyanide based salt bath (liquid nitriding) and plasma medium (plasma nitriding). However, plasma nitriding has recently received considerable industrial interest owing to its characteristic of faster nitrogen penetration, short treatment time, low process temperature, minimal distortion, low energy use and easier control of layer formation compared with conventional techniques such as gas and liquid nitriding. This process can be used for all ferrous materials including stainless steels. Plasma nitriding is carried out using a gas mixture of nitrogen and hydrogen gas at sub atmospheric pressures hence, making it eco-friendly in nature. Plasma nitriding allows modification of the surface layers and hardness profiles by changing the gas mixture and temperature. The wide applicable temperature range enables a multitude of applications, beyond the possibilities of gas or salt bath processes. This has led to numerous applications of this process in industries such as the manufacture of machine parts for plastics and food processing, packaging and tooling as well as pumps and hydraulic, machine

  5. Microwave Excitation In ECRIS plasmas

    International Nuclear Information System (INIS)

    Ciavola, G.; Celona, L.; Consoli, F.; Gammino, S.; Maimone, F.; Barbarino, S.; Catalano, R. S.; Mascali, D.; Tumino, L.

    2007-01-01

    A number of phenomena related to the electron cyclotron resonance ion sources (ECRIS) has been better understood recently by means of the improvement of comprehension of the coupling mechanism between microwave generators and ECR plasma. In particular, the two frequency heating and the frequency tuning effect, that permit a remarkable increase of the current for the highest charge states ions, can be explained in terms of modes excitation in the cylindrical cavity of the plasma chamber. Calculations based on this theoretical approach have been performed, and the major results will be presented. It will be shown that the electric field pattern completely changes for a few MHz frequency variations and the changes in ECRIS performances can be correlated to the efficiency of the power transfer between electromagnetic field and plasma

  6. RF plasma nitriding of severely deformed iron-based alloys

    International Nuclear Information System (INIS)

    Ferkel, H.; Glatzer, M.; Estrin, Y.; Valiev, R.Z.; Blawert, C.; Mordike, B.L.

    2003-01-01

    The effect of severe plastic deformation by cold high pressure torsion (HPT) on radio frequency (RF) plasma nitriding of pure iron, as well as St2K50 and X5CrNi1810 steels was investigated. Nitriding was carried out for 3 h in a nitrogen atmosphere at a pressure of 10 -5 bar and temperatures of 350 and 400 deg. C. Nitrided specimens were analysed by scanning electron microscopy (SEM), X-ray diffraction and micro hardness measurements. It was found that HPT enhances the effect of nitriding leading almost to doubling of the thickness of the nitrided layer for pure iron and the high alloyed steel. The largest increase in hardness was observed when HPT was combined with RF plasma nitriding at 350 deg. C. In the case of pure iron, the X-ray diffraction spectra showed the formation of ε and γ' nitrides in the compound layer, with a preferential formation of γ' at the expense of the α-phase at the higher nitriding temperature. The corresponding surface hardness was up to 950 HV0.01. While the HPT-processed St2K50 exhibits both nitride phases after nitriding at 350 deg. C, only the γ'-phase was observed after nitriding at 400 deg. C. A surface hardness of up to 1050 HV0.01 was measured for this steel. The high alloyed steel X5CrNi1810 exhibited the highest increase in surface hardness when HPT was combined with nitriding at 350 deg. C. The surface hardness of this steel was greater than 1400 HV0.025. The XRD analyses indicate the formation of the expanded austenite (S-phase) in the surface layer as a result of RF plasma nitriding. Furthermore, after HPT X5CrNi1810 was transformed completely into deformation martensite which did not transform back to austenite under thermochemical treatment. However, in the case of nitriding of the HPT-processed high alloyed steel at 400 deg. C, the formation of the S-phase was less pronounced. In view of the observed XRD peak broadening, the formation of nitrides, such as e.g. CrN, cannot be ruled out

  7. Microwave studies of gas discharge plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Brown, S C [Department of Physics and the Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA (United States)

    1958-07-01

    The plasma diagnostics in absence and in presence of magnetic field is discussed. It is concluded that it is not possible, even for low electron densities, to obtain a general theory in a form suitable for experimental verification and use in the microwave diagnostics of magnetized plasma, and valid for all possible configurations of the microwave field. Consequently, only a few special configurations of the microwave field are analysed.

  8. A microwave-augmented plasma torch module

    International Nuclear Information System (INIS)

    Kuo, S P; Bivolaru, Daniel; Williams, Skip; Carter, Campbell D

    2006-01-01

    A new plasma torch device which combines arc and microwave discharges to enhance the size and enthalpy of the plasma torch is described. A cylindrical-shaped plasma torch module is integrated into a tapered rectangular cavity to form a microwave adaptor at one end, which couples the microwave power injected into the cavity from the other end to the arc plasma generated by the torch module. A theoretical study of the microwave coupling from the cavity to the plasma torch, as the load, is presented. The numerical results indicate that the microwave power coupling efficiency exceeds 80%. Operational tests of the device indicate that the microwave power is coupled to the plasma torch and that the arc discharge power is increased. The addition of microwave energy enhances the height, volume and enthalpy of the plasma torch when the torch operates at a low airflow rate, and even when the flow speed is supersonic, a noticeable microwave effect on the plasma torch is observed. In addition, the present design allows the torch to be operated as both a fuel injector and igniter. Ignition of ethylene fuel injected through the centre of a tungsten carbide tube acting as the central electrode is demonstrated

  9. Microstructural characterization of pulsed plasma nitrided 316L stainless steel

    International Nuclear Information System (INIS)

    Asgari, M.; Barnoush, A.; Johnsen, R.; Hoel, R.

    2011-01-01

    Highlights: → The low temperature pulsed plasma nitrided layer of 316 SS was studied. → The plastic deformation induced in the austenite due to nitriding is characterized by EBSD at different depths (i.e., nitrogen concentration). → Nanomechanical properties of the nitride layer was investigated by nanoindentation at different depths (i.e., nitrogen concentration). → High hardness, high nitrogen concentration and high dislocation density is detected in the nitride layer. → The hardness and nitrogen concentration decreased sharply beyond the nitride layer. - Abstract: Pulsed plasma nitriding (PPN) treatment is one of the new processes to improve the surface hardness and tribology behavior of austenitic stainless steels. Through low temperature treatment (<440 deg. C), it is possible to obtain unique combinations of wear and corrosion properties. Such a combination is achieved through the formation of a so-called 'extended austenite phase'. These surface layers are often also referred to as S-phase, m-phase or γ-phase. In this work, nitrided layers on austenitic stainless steels AISI 316L (SS316L) were examined by means of a nanoindentation method at different loads. Additionally, the mechanical properties of the S-phase at different depths were studied. Electron back-scatter diffraction (EBSD) examination of the layer showed a high amount of plasticity induced in the layer during its formation. XRD results confirmed the formation of the S-phase, and no deleterious CrN phase was detected.

  10. Characterization of plasma nitrided layers produced on sintered iron

    Directory of Open Access Journals (Sweden)

    Marcos Alves Fontes

    2014-07-01

    Full Text Available Plasma nitriding is a thermo-physical-chemical treatment process, which promotes surface hardening, caused by interstitial diffusion of atomic nitrogen into metallic alloys. In this work, this process was employed in the surface modification of a sintered ferrous alloy. Scanning electron microscopy (SEM, X-ray diffraction (XRD analyses, and wear and microhardness tests were performed on the samples submitted to ferrox treatment and plasma nitriding carried out under different conditions of time and temperature. The results showed that the nitride layer thickness is higher for all nitrided samples than for ferrox treated samples, and this layer thickness increases with nitriding time and temperature, and temperature is a more significant variable. The XRD analysis showed that the nitrided layer, for all samples, near the surface consists in a mixture of γ′-Fe4N and ɛ-Fe3N phases. Both wear resistance and microhardness increase with nitriding time and temperature, and temperature influences both the characteristics the most.

  11. Surface modification of 17-4PH stainless steel by DC plasma nitriding and titanium nitride film duplex treatment

    International Nuclear Information System (INIS)

    Qi, F.; Leng, Y.X.; Huang, N.; Bai, B.; Zhang, P.Ch.

    2007-01-01

    17-4PH stainless steel was modified by direct current (DC) plasma nitriding and titanium nitride film duplex treatment in this study. The microstructure, wear resistance and corrosion resistance were characterized by X-ray diffraction (XRD), pin-on-disk tribological test and polarization experiment. The results revealed that the DC plasma nitriding pretreatment was in favor of improving properties of titanium nitride film. The corrosion resistance and wear resistance of duplex treatment specimen was more superior to that of only coated titanium nitride film

  12. Characterization of a microwave generated plasma

    International Nuclear Information System (INIS)

    Root, D.J.; Mahoney, L.; Asmussen, J.

    1986-01-01

    Recent experiments have demonstrated a microwave ion beam source without and with static magnetic fields in inert gases and in oxygen gases. This plasma generation configuration also has uses in the areas of plasma processing such as plasma etching, plasma assisted thin flim deposition and plasma assisted oxide growth. These ion beam and plasma processing applications have provided motivation to investigate microwave discharge properties, such as electron density, electron temperature, gas temperature, degree of ionization, etc., of the microwave generated plasma over a wide range of experimental operating conditions. This paper presents the results of experimental measurements which attempt to characterize the experimental microwave discharge in the absence of a static magnetic field. Measurements from a double probe, which is located in the plasma in a zero microwave field region, are presented in argon, xenon and oxygen gases. Variations of plasma density and electron temperature versus absorbed microwave power, gas pressure (0.2 m Torr to 200 m Torr) and discharge diffusion length are presented and compared to dc positive column discharge theory

  13. Simple microwave plasma source at atmospheric pressure

    International Nuclear Information System (INIS)

    Kim, Jeong H.; Hong, Yong C.; Kim, Hyoung S.; Uhm, Han S.

    2003-01-01

    We have developed a thermal plasma source operating without electrodes. One electrodeless torch is the microwave plasma-torch, which can produce plasmas in large quantities. We can generate plasma at an atmospheric pressure by marking use of the same magnetrons used as commercial microwave ovens. Most of the magnetrons are operated at the frequency of 2.45 GHz; the magnetron power microwave is about 1kW. Electromagnetic waves from the magnetrons propagate through a shorted waveguide. Plasma was generated under a resonant condition, by an auxiliary ignition system. The plasma is stabilized by vortex stabilization. Also, a high-power and high-efficiency microwave plasma-torch has been operated in air by combining two microwave plasma sources with 1kW, 2.45 GHz. They are arranged in series to generate a high-power plasma flame. The second torch adds all its power to the plasma flame of the first torch. Basically, electromagnetic waves in the waveguide were studied by a High Frequency Structure Simulator (HFSS) code and preliminary experiments were conducted

  14. Effect of gas pressure on active screen plasma nitriding response

    International Nuclear Information System (INIS)

    Nishimoto, Akio; Nagatsuka, Kimiaki; Narita, Ryota; Nii, Hiroaki; Akamatsu, Katsuya

    2010-01-01

    An austenitic stainless steel AISI 304 was active screen plasma nitrided using a 304 steel screen to investigate the effect of the gas pressure on the ASPN response. The sample was treated for 18 ks at 723 K in 25% N2 + 75% H2 gases. The gas pressure was changed to 100, 600 and 1200 Pa. The distance between screen and sample was also changed to 10, 30 and 50 mm. The nitrided samples were characterized by appearance observation, surface roughness, optical microscopy, X-ray diffraction, and microhardness testing. After nitriding, polygonal particles with a normal distribution were observed at the center and edges of all the ASPN-treated sample surfaces. Particles on the sample surfaces were finer with an increase in the gas pressure. The nitrided layer with a greater and homogeneous thickness was obtained at a low gas pressure of 100 Pa. (author)

  15. MICROWAVE INTERACTIONS WITH INHOMOGENEOUS PARTIALLY IONIZED PLASMA

    Energy Technology Data Exchange (ETDEWEB)

    Kritz, A. H.

    1962-11-15

    Microwave interactions with inhomogeneous plasmas are often studied by employing a simplified electromagnetic approach, i.e., by representing the effects of the plasma by an effective dielectric coefficient. The problems and approximations associated with this procedure are discussed. The equation describing the microwave field in an inhomogeneous partially ionized plasma is derived, and the method that is applied to obtain the reflected, transmitted, and absorbed intensities in inhomogeneous plasmas is presented. The interactions of microwaves with plasmas having Gaussian electron density profiles are considered. The variation of collision frequency with position is usually neglected. In general, the assumption of constant collision frequency is not justified; e.g., for a highly ionized plasma, the electron density profile determines, in part, the profile of the electron-ion collision frequency. The effect of the variation of the collision frequency profile on the interaction of microwaves with inhomogeneous plasmas is studied in order to obtain an estimate of the degree of error that may result when constant collision frequency is assumed instead of a more realistic collision frequency profile. It is shown that the degree of error is of particular importance when microwave analysis is used as a plasma diagnostic. (auth)

  16. Laser diagnostics and modelling of microwave plasmas

    NARCIS (Netherlands)

    Carbone, E.A.D.

    2013-01-01

    Microwave induced plasmas are applied in many fabrication processes such as the deposition of SiO2 for the production of optical fibers and the deposition of Si to make solar cells. To control these deposition processes a good understanding of the plasma kinetics is required. Experimental

  17. RF and microwave diagnostics of plasma

    International Nuclear Information System (INIS)

    Basu, J.

    1976-01-01

    A brief review of RF and microwave investigations carried out at laboratory plasma is presented. Both the immersive and non-immersive RF probes of various types are discussed, the major emphasis being laid on the work carried out in extending the scope of the immersive impedance probe and non-immersive coil probe. The standard microwave methods for plasma diagnosis are mentioned. The role of relatively new diagnostic tool, viz., a dielectric-rod waveguide, is described, and the technique of measuring the admittance of such a waveguide (or an antenna) enveloped in plasma is discussed. (K.B.)

  18. Hydrogen diffusion between plasma-deposited silicon nitride-polyimide polymer interfaces

    International Nuclear Information System (INIS)

    Nguyen, S.V.; Kerbaugh, M.

    1988-01-01

    This paper reports a nuclear reaction analysis (NRA) for hydrogen technique used to analyze the hydrogen concentration near plasma enhanced chemical vapor deposition (PECVD) silicon nitride-polyimide interfaces at various nitride-deposition and polyimide-polymer-curing temperatures. The CF 4 + O 2 (8% O 2 ) plasma-etch-rate variation of PECVD silicon nitride films deposited on polyimide appeared to correlate well with the variation of hydrogen-depth profiles in the nitride films. The NRA data indicate that hydrogen-depth-profile fluctuation in the nitride films is due to hydrogen diffusion between the nitride-polyimide interfaces during deposition. Annealing treatment of polyimide films in a hydrogen atmosphere prior to the nitride film deposition tends to enhance the hydrogen-depth-profile uniformity in the nitride films, and thus substantially reduces or eliminates variation in the nitride plasma-etch rate

  19. Tribological properties of plasma and pulse plasma nitrided AISI 4140 steel

    Energy Technology Data Exchange (ETDEWEB)

    Podgornik, B.; Vizintin, J. [Ljubljana Univ. (Slovenia). Center of Tribology and Tech. Diagnostics; Leskovsek, V. [Inst. of Metals and Technologies, Ljubljana (Slovenia)

    1998-10-10

    Plasma nitriding is usually used for ferrous materials to improve their surface properties. Knowledge of the properties of thin surface layers is essential for designing engineering components with optimal wear performance. In our study, we investigated the microstructural, mechanical and tribological properties of plasma- and pulse plasma-nitrided AISI 4140 steel in comparison to hardened steel. The influence of nitriding case depth as well as the presence of a compound layer on its tribological behaviour was also examined. Plasma and pulse plasma nitriding were carried out using commercial nitriding processes. Nitrided samples were fully characterised, using metallographic, SEM microscopic, microhardness and profilometric techniques, before and after wear testing. Wear tests were performed on a pin-on-disc wear testing machine in which nitrided pins were mated to hardened ball bearing steel discs. The wear tests were carried out under dry conditions where hardened samples were used as a reference. The resulting wear loss as well as the coefficient of friction was monitored as a function of load and test time. Several microscopic techniques were used to analyse the worn surfaces and wear debris in order to determine the dominant friction and wear characteristics. Results showed improved tribological properties of AISI 4140 steel after plasma and pulse plasma nitriding compared to hardening. However, the compound layer should be removed from the surface by mechanical means or by decreasing the amount of nitrogen in the nitriding atmosphere, to avoid impairment of the tribological properties by fracture of the hard and brittle compound layer followed by the formation of hard abrasive particles. (orig.) 10 refs.

  20. Thermal plasma synthesis of transition metal nitrides and alloys

    International Nuclear Information System (INIS)

    Ronsheim, P.; Christensen, A.N.; Mazza, A.

    1981-01-01

    Applications of arc plasma processing to high-temperature chemistry of Group V nitrides and Si and Ge alloys are studied. The transition metal nitrides 4f-VN, 4f-NbN, and 4f-TaN are directly synthesized in a dc argon-nitrogen plasma from powders of the metals. A large excess of N 2 is required to form stoichiometric 4f-VN, while the Nb and Ta can only be synthesized with a substoichiometric N content. In a dc argon plasma the alloys V 3 Si, VSi 2 , NbSi 2 , NbGe 2 , Cr 3 Si, and Mo 3 Si are obtained from powder mixtures of the corresponding elements. The compounds are identified by x-ray diffraction patterns and particle shape and size are studied by electron microscopy

  1. Microwave produced plasma in a Toroidal Device

    Science.gov (United States)

    Singh, A. K.; Edwards, W. F.; Held, E. D.

    2010-11-01

    A currentless toroidal plasma device exhibits a large range of interesting basic plasma physics phenomena. Such a device is not in equilibrium in a strict magneto hydrodynamic sense. There are many sources of free energy in the form of gradients in plasma density, temperature, the background magnetic field and the curvature of the magnetic field. These free energy sources excite waves and instabilities which have been the focus of studies in several devices in last two decades. A full understanding of these simple plasmas is far from complete. At Utah State University we have recently designed and installed a microwave plasma generation system on a small tokamak borrowed from the University of Saskatchewan, Saskatoon, Canada. Microwaves are generated at 2.45 GHz in a pulsed dc mode using a magnetron from a commercial kitchen microwave oven. The device is equipped with horizontal and vertical magnetic fields and a transformer to impose a toroidal electric field for current drive. Plasmas can be obtained over a wide range of pressure with and without magnetic fields. We present some preliminary measurements of plasma density and potential profiles. Measurements of plasma temperature at different operating conditions are also presented.

  2. Microwave Plasma Sources for Gas Processing

    International Nuclear Information System (INIS)

    Mizeraczyk, J.; Jasinski, M.; Dors, M.; Zakrzewski, Z.

    2008-01-01

    In this paper atmospheric pressure microwave discharge methods and devices used for producing the non-thermal plasmas for processing of gases are presented. The main part of the paper concerns the microwave plasma sources (MPSs) for environmental protection applications. A few types of the MPSs, i.e. waveguide-based surface wave sustained MPS, coaxial-line-based and waveguide-based nozzle-type MPSs, waveguide-based nozzleless cylinder-type MPS and MPS for microdischarges are presented. Also, results of the laboratory experiments on the plasma processing of several highly-concentrated (up to several tens percent) volatile organic compounds (VOCs), including Freon-type refrigerants, in the moderate (200-400 W) waveguide-based nozzle-type MPS (2.45 GHz) are presented. The results showed that the microwave discharge plasma fully decomposed the VOCs at relatively low energy cost. The energy efficiency of VOCs decomposition reached 1000 g/kWh. This suggests that the microwave discharge plasma can be a useful tool for environmental protection applications. In this paper also results of the use of the waveguide-based nozzleless cylinder-type MPS to methane reforming into hydrogen are presented

  3. Atmospheric pressure microwave plasma system with ring waveguide

    International Nuclear Information System (INIS)

    Liu Liang; Zhang Guixin; Zhu Zhijie; Luo Chengmu

    2007-01-01

    Some scientists used waveguide as the cavity to produce a plasma jet, while large volume microwave plasma was relatively hard to get in atmospheric pressure. However, a few research institutes have already developed devices to generate large volume of atmospheric pressure microwave plasma, such as CYRANNUS and SLAN series, which can be widely applied. In this paper, present a microwave plasma system with ring waveguide to excite large volume of atmospheric pressure microwave plasma, plot curves on theoretical disruption electric field of some working gases, emulate the cavity through software, measure the power density to validate and show the appearance of microwave plasma. At present, large volume of argon and helium plasma have already been generated steadily by atmospheric pressure microwave plasma system. This research can build a theoretical basis of microwave plasma excitation under atmospheric pressure and will be useful in study of the device. (authors)

  4. Microwave reflectometry for fusion plasma diagnostics

    International Nuclear Information System (INIS)

    1992-01-01

    This document contains a collection of 26 papers on ''Microwave Reflectometry for Fusion Plasma Diagnostics'', presented at the IAEA Technical Committee Meeting of the same name held at the JET Joint Undertaking, Abingdon, United Kingdom, March 4-6, 1992. It contains five papers on the measurement of plasma density profiles, six papers on theory and simulations in support of the development and application of this type of plasma diagnostics, eight papers on the measurement of density transients and fluctuations, and seven on new approaches to reflectometry-based plasma diagnostics. Refs, figs and tabs

  5. [Experimental study on spectra of compressed air microwave plasma].

    Science.gov (United States)

    Liu, Yong-Xi; Zhang, Gui-Xin; Wang, Qiang; Hou, Ling-Yun

    2013-03-01

    Using a microwave plasma generator, compressed air microwave plasma was excited under 1 - 5 atm pressures. Under different pressures and different incident microwave power, the emission spectra of compressed air microwave plasma were studied with a spectra measuring system. The results show that continuum is significant at atmospheric pressure and the characteristic will be weakened as the pressure increases. The band spectra intensity will be reduced with the falling of the incident microwave power and the band spectra were still significant. The experimental results are valuable to studying the characteristics of compressed air microwave plasma and the generating conditions of NO active groups.

  6. Radio frequency plasma nitriding of aluminium at higher power levels

    International Nuclear Information System (INIS)

    Gredelj, Sabina; Kumar, Sunil; Gerson, Andrea R.; Cavallaro, Giuseppe P.

    2006-01-01

    Nitriding of aluminium 2011 using a radio frequency plasma at higher power levels (500 and 700 W) and lower substrate temperature (500 deg. C) resulted in higher AlN/Al 2 O 3 ratios than obtained at 100 W and 575 deg. C. AlN/Al 2 O 3 ratios derived from X-ray photoelectron spectroscopic analysis (and corroborated by heavy ion elastic recoil time of flight spectrometry) for treatments preformed at 100 (575 deg. C), 500 (500 deg. C) and 700 W (500 deg. C) were 1.0, 1.5 and 3.3, respectively. Scanning electron microscopy revealed that plasma nitrided surfaces obtained at higher power levels exhibited much finer nodular morphology than obtained at 100 W

  7. Microwave plasma emerging technologies for chemical processes

    NARCIS (Netherlands)

    de la Fuente, Javier F.; Kiss, Anton A.; Radoiu, Marilena T.; Stefanidis, Georgios D.

    2017-01-01

    Microwave plasma (MWP) technology is currently being used in application fields such as semiconductor and material processing, diamond film deposition and waste remediation. Specific advantages of the technology include the enablement of a high energy density source and a highly reactive medium,

  8. Synthesis of ammonia with microwave plasma

    International Nuclear Information System (INIS)

    Xu Wenguo; Yu Aimin; Liu Jun; Jin Qinhan

    1991-01-01

    THe synthesis of ammonia absorbed on 13X zeolite with the aid of microwave plasma is described. The ammonia molecule absorbed on 13X zeolite as ammonium ions were detected by IR spectroscopy. The results obtained show that the ammonia synthesis is facilitated by the surface reactions of NH x (x = 1, 2) radicals adsorbed on zeolite with hydrogen atoms

  9. Comparative study involving the uranium determination through catalytic reduction of nitrates and nitrides by using decoupled plasma nitridation (DPN)

    International Nuclear Information System (INIS)

    Aguiar, Marco Antonio Souza; Gutz, Ivano G. Rolf

    1999-01-01

    This paper reports a comparative study on the determination of uranium through the catalytic reduction of nitrate and nitride using the decoupled plasma nitridation. The uranyl ions are a good catalyst for the reduction of NO - 3 and NO - 2 ions on the surface of a hanging drop mercury electrode (HDME). The presence of NO - in a solution with p H = 3 presented a catalytic signal more intense than the signal obtained with NO - 3 (concentration ten times higher). A detection limit of 1x10 9 M was obtained using the technique of decoupled plasma nitridation (DPN), suggesting the development of a sensitive way for the determination of uranium in different matrixes

  10. Microwave plasma for hydrogen production from liquids

    Directory of Open Access Journals (Sweden)

    Czylkowski Dariusz

    2016-06-01

    Full Text Available The hydrogen production by conversion of liquid compounds containing hydrogen was investigated experimentally. The waveguide-supplied metal cylinder-based microwave plasma source (MPS operated at frequency of 915 MHz at atmospheric pressure was used. The decomposition of ethanol, isopropanol and kerosene was performed employing plasma dry reforming process. The liquid was introduced into the plasma in the form of vapour. The amount of vapour ranged from 0.4 to 2.4 kg/h. Carbon dioxide with the flow rate ranged from 1200 to 2700 NL/h was used as a working gas. The absorbed microwave power was up to 6 kW. The effect of absorbed microwave power, liquid composition, liquid flow rate and working gas fl ow rate was analysed. All these parameters have a clear influence on the hydrogen production efficiency, which was described with such parameters as the hydrogen production rate [NL(H2/h] and the energy yield of hydrogen production [NL(H2/kWh]. The best achieved experimental results showed that the hydrogen production rate was up to 1116 NL(H2/h and the energy yield was 223 NL(H2 per kWh of absorbed microwave energy. The results were obtained in the case of isopropanol dry reforming. The presented catalyst-free microwave plasma method can be adapted for hydrogen production not only from ethanol, isopropanol and kerosene, but also from different other liquid compounds containing hydrogen, like gasoline, heavy oils and biofuels.

  11. Humidity-dependent stability of amorphous germanium nitrides fabricated by plasma nitridation

    International Nuclear Information System (INIS)

    Kutsuki, Katsuhiro; Okamoto, Gaku; Hosoi, Takuji; Shimura, Takayoshi; Watanabe, Heiji

    2007-01-01

    We have investigated the stability of amorphous germanium nitride (Ge 3 N 4 ) layers formed by plasma nitridation of Ge(100) surfaces using x-ray photoelectron spectroscopy and atomic force microscopy. We have found that humidity in the air accelerates the degradation of Ge 3 N 4 layers and that under 80% humidity condition, most of the Ge-N bonds convert to Ge-O bonds, producing a uniform GeO 2 layer, within 12 h even at room temperature. After this conversion of nitrides to oxides, the surface roughness drastically increased by forming GeO 2 islands on the surfaces. These findings indicate that although Ge 3 N 4 layers have superior thermal stability compared to the GeO 2 layers, Ge 3 N 4 reacts readily with hydroxyl groups and it is therefore essential to take the best care of the moisture in the fabrication of Ge-based devices with Ge 3 N 4 insulator or passivation layers

  12. Microwave interferometry of PEOS plasma sources

    International Nuclear Information System (INIS)

    Weber, B.V.; Commisso, R.J.; Goodrich, P.J.; Hinshelwood, D.D.; Neri, J.M.

    1988-01-01

    A 70 GHz microwave interferometer is used to measure the electron density for various configurations of sources used in plasma erosion opening switch (PEOS) experiments. The interferometer is a phase quadrature system, so the density can be measured as a function of time without ambiguity. Measurements have been made for carbon guns and flashboards driven by a .6 μF. 25 kV capacitor. The plasma density from a gun rises to its peak value in about 10 μs. Then decays in the next 40 μs. A metal screen placed between the gun and the microwave beam attenuates the plasma density by a factor greater than the geometrical transparency of the screen. Density measurements as a function of distance from the gun are analyzed to give the plasma spatial dependence, and the particle flux density and flow velocity are calculated from the continuity equation. Density values used to model previous PEOS experiments are comparable to the values measured here. The flashboard sources produce a denser, faster plasma that is more difficult to diagnose with the interferometer than the gun plasma because of refractive bending of the microwave beam. Reducing the plasma length reduces the refractive bending enough that some measurements are possible. Direct comparison with Gamble II PEOS experiments that used these flashboard sources may not be possible at this frequency because of refraction, but estimates based on measurements at larger distances give reasonable agreement with values used to model these experiments. Other measurements that will be presented include the effects of plasma flow against metal walls, effects of changing the driving current waveform, measurements made in actual experimental configurations and comparisons with Faraday cup and electric probe measurements

  13. Microwave power coupling in a surface wave excited plasma

    Directory of Open Access Journals (Sweden)

    Satyananda Kar

    2015-01-01

    Full Text Available In recent decades, different types of plasma sources have been used for various types of plasma processing, such as, etching and thin film deposition. The critical parameter for effective plasma processing is high plasma density. One type of high density plasma source is Microwave sheath-Voltage combination Plasma (MVP. In the present investigation, a better design of MVP source is reported, in which over-dense plasma is generated for low input microwave powers. The results indicate that the length of plasma column increases significantly with increase in input microwave power.

  14. Device performance of in situ steam generated gate dielectric nitrided by remote plasma nitridation

    International Nuclear Information System (INIS)

    Al-Shareef, H. N.; Karamcheti, A.; Luo, T. Y.; Bersuker, G.; Brown, G. A.; Murto, R. W.; Jackson, M. D.; Huff, H. R.; Kraus, P.; Lopes, D.

    2001-01-01

    In situ steam generated (ISSG) oxides have recently attracted interest for use as gate dielectrics because of their demonstrated reliability improvement over oxides formed by dry oxidation. [G. Minor, G. Xing, H. S. Joo, E. Sanchez, Y. Yokota, C. Chen, D. Lopes, and A. Balakrishna, Electrochem. Soc. Symp. Proc. 99-10, 3 (1999); T. Y. Luo, H. N. Al-Shareef, G. A. Brown, M. Laughery, V. Watt, A. Karamcheti, M. D. Jackson, and H. R. Huff, Proc. SPIE 4181, 220 (2000).] We show in this letter that nitridation of ISSG oxide using a remote plasma decreases the gate leakage current of ISSG oxide by an order of magnitude without significantly degrading transistor performance. In particular, it is shown that the peak normalized transconductance of n-channel devices with an ISSG oxide gate dielectric decreases by only 4% and the normalized drive current by only 3% after remote plasma nitridation (RPN). In addition, it is shown that the reliability of the ISSG oxide exhibits only a small degradation after RPN. These observations suggest that the ISSG/RPN process holds promise for gate dielectric applications. [copyright] 2001 American Institute of Physics

  15. Fuel gas production by microwave plasma in liquid

    International Nuclear Information System (INIS)

    Nomura, Shinfuku; Toyota, Hiromichi; Tawara, Michinaga; Yamashita, Hiroshi; Matsumoto, Kenya

    2006-01-01

    We propose to apply plasma in liquid to replace gas-phase plasma because we expect much higher reaction rates for the chemical deposition of plasma in liquid than for chemical vapor deposition. A reactor for producing microwave plasma in a liquid could produce plasma in hydrocarbon liquids and waste oils. Generated gases consist of up to 81% hydrogen by volume. We confirmed that fuel gases such as methane and ethylene can be produced by microwave plasma in liquid

  16. Band gap effects of hexagonal boron nitride using oxygen plasma

    Energy Technology Data Exchange (ETDEWEB)

    Sevak Singh, Ram; Leong Chow, Wai [School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798 (Singapore); Yingjie Tay, Roland [School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798 (Singapore); Temasek Laboratories-NTU, 50 Nanyang Avenue, Singapore 639798 (Singapore); Hon Tsang, Siu [Temasek Laboratories-NTU, 50 Nanyang Avenue, Singapore 639798 (Singapore); Mallick, Govind [Temasek Laboratories-NTU, 50 Nanyang Avenue, Singapore 639798 (Singapore); Weapons and Materials Research Directorate, U.S. Army Research Laboratory, Aberdeen Proving Ground, Maryland 21005 (United States); Tong Teo, Edwin Hang, E-mail: htteo@ntu.edu.sg [School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798 (Singapore); School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798 (Singapore)

    2014-04-21

    Tuning of band gap of hexagonal boron nitride (h-BN) has been a challenging problem due to its inherent chemical stability and inertness. In this work, we report the changes in band gaps in a few layers of chemical vapor deposition processed as-grown h-BN using a simple oxygen plasma treatment. Optical absorption spectra show a trend of band gap narrowing monotonically from 6 eV of pristine h-BN to 4.31 eV when exposed to oxygen plasma for 12 s. The narrowing of band gap causes the reduction in electrical resistance by ∼100 fold. The x-ray photoelectron spectroscopy results of plasma treated hexagonal boron nitride surface show the predominant doping of oxygen for the nitrogen vacancy. Energy sub-band formations inside the band gap of h-BN, due to the incorporation of oxygen dopants, cause a red shift in absorption edge corresponding to the band gap narrowing.

  17. Band gap effects of hexagonal boron nitride using oxygen plasma

    International Nuclear Information System (INIS)

    Sevak Singh, Ram; Leong Chow, Wai; Yingjie Tay, Roland; Hon Tsang, Siu; Mallick, Govind; Tong Teo, Edwin Hang

    2014-01-01

    Tuning of band gap of hexagonal boron nitride (h-BN) has been a challenging problem due to its inherent chemical stability and inertness. In this work, we report the changes in band gaps in a few layers of chemical vapor deposition processed as-grown h-BN using a simple oxygen plasma treatment. Optical absorption spectra show a trend of band gap narrowing monotonically from 6 eV of pristine h-BN to 4.31 eV when exposed to oxygen plasma for 12 s. The narrowing of band gap causes the reduction in electrical resistance by ∼100 fold. The x-ray photoelectron spectroscopy results of plasma treated hexagonal boron nitride surface show the predominant doping of oxygen for the nitrogen vacancy. Energy sub-band formations inside the band gap of h-BN, due to the incorporation of oxygen dopants, cause a red shift in absorption edge corresponding to the band gap narrowing

  18. Frequency effects and properties of plasma deposited fluorinated silicon nitride

    International Nuclear Information System (INIS)

    Chang, C.; Flamm, D.L.; Ibbotson, D.E.; Mucha, J.A.

    1988-01-01

    The properties of low-hydrogen, fluorinated plasma-enhanced chemical vapor deposition (PECVD) silicon nitride films grown using NF 3 /SiH 4 /N 2 feed mixtures in 200 kHz and 14 MHz discharges were compared. High-energy ion bombardment at 200 kHz is expected to enhance surface diffusion and chemical reconstruction. Compared to fluorinated silicon nitride deposited at 14 MHz under otherwise comparable conditions, the 200 kHz films had a lower Si--H bond concentration (approx. 21 cm -3 ), lower total hydrogen content (5--8 x 10 21 cm -3 ), better resistance to oxidation, lower compressive stress (-0.7 to -1.5 Gdyne/cm), and higher density (3.1 g/cm 3 ). The dielectric constant of better low-frequency Class I films was constant to 500 MHz, while that of high-frequency films fell up to 15% between 100 Hz and 10 MHz. The absorption edges of low-frequency PECVD fluorinated silicon nitride films were between 5.0 and 6.1 eV, which compare with 4.4 to 5.6 eV for the high-excitation frequency fluorinated material and 3 to 4 eV for conventional PECVD nitride. However high-frequency films may have fewer trap centers and a lower dielectric constant. 14 MHz p-SiN:F films grown with NH 3 as an auxiliary nitrogen source showed absorption edges similar to low-frequency material grown from NF 3 /SiH 4 /N 2 , but they have substantially more N--H bonding. The dielectric constant and absorption edge of these films were comparable to those of low-frequency p-SiN:F from NF 3 /SiH 4 /N 2

  19. Poloidal rotation velocity measurement in toroidal plasmas via microwave reflectometry

    International Nuclear Information System (INIS)

    Pavlichenko, O.S.; Skibenko, A.I.; Fomin, I.P.; Pinos, I.B.; Ocheretenko, V.L.; Berezhniy, V.L.

    2001-01-01

    Results of experiment modeling backscattering of microwaves from rotating plasma layer perturbed by fluctuations are presented. It was shown that auto- and crosscorrelation of reflected power have a periodicity equal to rotation period. Such periodicity was observed by microwave reflectometry in experiments on RF plasma production on U-3M torsatron and was used for measurement of plasma poloidal rotation velocity. (author)

  20. Downstream microwave ammonia plasma treatment of polydimethylsiloxane

    International Nuclear Information System (INIS)

    Pruden, K.G.; Beaudoin, S.P.

    2005-01-01

    To control the interactions between surfaces and biological systems, it is common to attach polymers, proteins, and other species to the surfaces of interest. In this case, surface modification of polydimethylsiloxane (PDMS) was performed by exposing PDMS films to the effluent from a microwave ammonia plasma, with a goal of creating primary amine groups on the PDMS. These amine sites were to be used as binding sites for polymer attachment. Chemical changes to the surface of the PDMS were investigated as a function of treatment time, microwave power, and PDMS temperature during plasma treatment. Functional groups resulting from this treatment were characterized using attenuated total reflectance infrared spectroscopy. Plasma treatment resulted in the incorporation of oxygen- and nitrogen-containing groups, including primary amine groups. In general, increasing the treatment time, plasma power and substrate temperature increased the level of oxidation of the films, and led to the formation of imines and nitriles. PDMS samples treated at 100 W and 23 deg. C for 120 s were chosen for proof-of-concept dextran coating. Samples treated at this condition contained primary amine groups and few oxygen-containing groups. To test the viability of the primary amines for attachment of biopolymers, functionalized dextran was successfully attached to primary amine sites on the PDMS films

  1. UN{sub 2−x} layer formed on uranium metal by glow plasma nitriding

    Energy Technology Data Exchange (ETDEWEB)

    Long, Zhong [China Academy of Engineering Physics, P.O. Box 919-71, Mianyang 621907 (China); Hu, Yin [Science and Technology on Surface Physics and Chemistry Laboratory, P.O. Box 718-35, Mianyang 621907 (China); Chen, Lin [China Academy of Engineering Physics, P.O. Box 919-71, Mianyang 621907 (China); Luo, Lizhu [Science and Technology on Surface Physics and Chemistry Laboratory, P.O. Box 718-35, Mianyang 621907 (China); Liu, Kezhao, E-mail: liukz@hotmail.com [Science and Technology on Surface Physics and Chemistry Laboratory, P.O. Box 718-35, Mianyang 621907 (China); Lai, Xinchun, E-mail: lai319@yahoo.com [Science and Technology on Surface Physics and Chemistry Laboratory, P.O. Box 718-35, Mianyang 621907 (China)

    2015-01-25

    Highlights: • We used a very simple method to prepare nitride layer on uranium metal surface. • This modified layer is nitrogen-rich nitride, which should be written as UN{sub 2−x}. • TEM images show the nitride layer is composed of nano-sized grains. • XPS analysis indicates there is uranium with abnormal low valence in the nitride. - Abstract: Glow plasma nitriding is a simple and economical surface treatment method, and this technology was used to prepare nitride layer on the surface of uranium metal with thickness of several microns. The composition and structure of the nitride layer were analyzed by AES and XRD, indicating that this modified layer is nitrogen-rich uranium nitride, which should be written as UN{sub 2−x}. TEM images show the nitride layer is composed of nano-sized grains, with compact structure. And XPS analysis indicates there is uranium with abnormal low valence existing in the nitride. After the treated uranium storage in air for a long time, oxygen just entered the surface several nanometers, showing the nitride layer has excellent oxidation resistance. The mechanism of nitride layer formation and low valence uranium appearance is discussed.

  2. UN2−x layer formed on uranium metal by glow plasma nitriding

    International Nuclear Information System (INIS)

    Long, Zhong; Hu, Yin; Chen, Lin; Luo, Lizhu; Liu, Kezhao; Lai, Xinchun

    2015-01-01

    Highlights: • We used a very simple method to prepare nitride layer on uranium metal surface. • This modified layer is nitrogen-rich nitride, which should be written as UN 2−x . • TEM images show the nitride layer is composed of nano-sized grains. • XPS analysis indicates there is uranium with abnormal low valence in the nitride. - Abstract: Glow plasma nitriding is a simple and economical surface treatment method, and this technology was used to prepare nitride layer on the surface of uranium metal with thickness of several microns. The composition and structure of the nitride layer were analyzed by AES and XRD, indicating that this modified layer is nitrogen-rich uranium nitride, which should be written as UN 2−x . TEM images show the nitride layer is composed of nano-sized grains, with compact structure. And XPS analysis indicates there is uranium with abnormal low valence existing in the nitride. After the treated uranium storage in air for a long time, oxygen just entered the surface several nanometers, showing the nitride layer has excellent oxidation resistance. The mechanism of nitride layer formation and low valence uranium appearance is discussed

  3. Investigating Tribological Characteristics of HVOF Sprayed AISI 316 Stainless Steel Coating by Pulsed Plasma Nitriding

    Science.gov (United States)

    Mindivan, H.

    2018-01-01

    In this study, surface modification of aluminum alloy using High-Velocity Oxygen Fuel (HVOF) thermal spray and pulsed plasma nitriding processes was investigated. AISI 316 stainless steel coating on 1050 aluminum alloy substrate by HVOF process was pulsed plasma nitrided at 793 K under 0.00025 MPa pressure for 43200 s in a gas mixture of 75 % N2 and 25 % H2. The results showed that the pulse plasma nitriding process produced a surface layer with CrN, iron nitrides (Fe3N, Fe4N) and expanded austenite (γN). The pulsed plasma nitrided HVOF-sprayed coating showed higher surface hardness, lower wear rate and coefficient of friction than the untreated HVOF-sprayed one.

  4. Structure and properties of nitrided surface layer produced on NiTi shape memory alloy by low temperature plasma nitriding

    International Nuclear Information System (INIS)

    Czarnowska, Elżbieta; Borowski, Tomasz; Sowińska, Agnieszka; Lelątko, Józef; Oleksiak, Justyna; Kamiński, Janusz; Tarnowski, Michał; Wierzchoń, Tadeusz

    2015-01-01

    Highlights: • Low temperature plasma nitriding process of NiTi shape memory alloy is presented. • The possibility of treatment details of sophisticated shape. • TiN surface layer has diffusive character. • TiN surface layer increases corrosion resistance of NiTi alloy. • Produced TiN layer modify the biological properties of NiTi alloy. - Abstract: NiTi shape memory alloys are used for bone and cardiological implants. However, on account of the metallosis effect, i.e. the release of the alloy elements into surrounding tissues, they are subjected to various surface treatment processes in order to improve their corrosion resistance and biocompatibility without influencing the required shape memory properties. In this paper, the microstructure, topography and morphology of TiN surface layer on NiTi alloy, and corrosion resistance, both before and after nitriding in low-temperature plasma at 290 °C, are presented. Examinations with the use of the potentiodynamic and electrochemical impedance spectroscopy methods were carried out and show an increase of corrosion resistance in Ringer's solution after glow-discharge nitriding. This surface titanium nitride layer also improved the adhesion of platelets and the proliferation of osteoblasts, which was investigated in in vitro experiments with human cells. Experimental data revealed that nitriding NiTi shape memory alloy under low-temperature plasma improves its properties for bone implant applications

  5. Structure and properties of nitrided surface layer produced on NiTi shape memory alloy by low temperature plasma nitriding

    Energy Technology Data Exchange (ETDEWEB)

    Czarnowska, Elżbieta [Children' s Memorial Health Institute, Pathology Department, Al. Dzieci Polskich 20, 04-730 Warsaw (Poland); Borowski, Tomasz [Warsaw University of Technology, Faculty of Materials Science and Engineering, Wołoska 141, 02-507 Warsaw (Poland); Sowińska, Agnieszka [Children' s Memorial Health Institute, Pathology Department, Al. Dzieci Polskich 20, 04-730 Warsaw (Poland); Lelątko, Józef [Silesia University, Faculty of Computer Science and Materials Science, 75 Pułku Piechoty 1A, 41-500 Chorzów (Poland); Oleksiak, Justyna; Kamiński, Janusz; Tarnowski, Michał [Warsaw University of Technology, Faculty of Materials Science and Engineering, Wołoska 141, 02-507 Warsaw (Poland); Wierzchoń, Tadeusz, E-mail: twierz@inmat.pw.edu.pl [Warsaw University of Technology, Faculty of Materials Science and Engineering, Wołoska 141, 02-507 Warsaw (Poland)

    2015-04-15

    Highlights: • Low temperature plasma nitriding process of NiTi shape memory alloy is presented. • The possibility of treatment details of sophisticated shape. • TiN surface layer has diffusive character. • TiN surface layer increases corrosion resistance of NiTi alloy. • Produced TiN layer modify the biological properties of NiTi alloy. - Abstract: NiTi shape memory alloys are used for bone and cardiological implants. However, on account of the metallosis effect, i.e. the release of the alloy elements into surrounding tissues, they are subjected to various surface treatment processes in order to improve their corrosion resistance and biocompatibility without influencing the required shape memory properties. In this paper, the microstructure, topography and morphology of TiN surface layer on NiTi alloy, and corrosion resistance, both before and after nitriding in low-temperature plasma at 290 °C, are presented. Examinations with the use of the potentiodynamic and electrochemical impedance spectroscopy methods were carried out and show an increase of corrosion resistance in Ringer's solution after glow-discharge nitriding. This surface titanium nitride layer also improved the adhesion of platelets and the proliferation of osteoblasts, which was investigated in in vitro experiments with human cells. Experimental data revealed that nitriding NiTi shape memory alloy under low-temperature plasma improves its properties for bone implant applications.

  6. Plasma source by microwaves: design description

    International Nuclear Information System (INIS)

    Camps, E.; Olea, O.; Andrade, R.; Anguiano, G.

    1992-03-01

    The design of a device for the formation of a plasma with densities of the order of 10 12 cm - 3 and low temperatures (T e ∼ 40 eV) is described. For such purpose it was carried out in the device a microwave discharge (f o = 2.45 GHz) in a resonator of high Q factor, immersed in a static external magnetic field. The device worked in the regime ω ce ≤ ω o /2 (ω ce - cyclotron frequency of the electrons, (ω o = 2 π f o ) where is possible the excitement of non lineal phenomena of waves transformation. (Author)

  7. Precision microwave applicators and systems for plasma and materials processing

    International Nuclear Information System (INIS)

    Asmussen, J.; Garard, R.

    1988-01-01

    Modern applications of microwave energy have imposed new requirements upon microwave processing systems. Interest in energy efficiency, processing uniformity and control of process cycles has placed new design conditions upon microwave power oscillators, microwave systems and microwave applicator design. One approach of meeting new application requirements is the use of single-mode or controlled multimode applicators. The use of a single-mode applicator for plasma generation and materials processing will be presented. Descriptions of actual applicator designs for heating, curing, and processing of solid materials and the generations of high and low pressure discharges will be given. The impact of these applicators on the total microwave system including the microwave power source will be described. Specific examples of applicator and associated microwave systems will be detailed for the applications of (1) plasma thin film deposition and (2) the precision processing and diagnosis of materials. Methods of process control and diagnosis, control of process uniformity and process scale up are discussed

  8. Plasma acceleration by means of microwave radiation pressure

    International Nuclear Information System (INIS)

    Fukumura, Takashi; Takamoto, Teruo

    1977-01-01

    In the electric discharge of gas with microwaves, intense reflection waves occur simultaneously with the discharge, so the plasma ionized and formed by the microwaves is accelerated due to large radiation pressure. The basic experiment made, aiming at plasma gun, is described. In the gas electric discharge, the plasma flow velocity proportional to the reflected power is obtained. For 550 W microwave input power, the plasma velocity of 1 x 10 4 m/s was obtained. The accelerated plasma is bunched; its front as mass travels, recombines and disappears. (Mori, K.)

  9. Microstructural characterization of an AISI-SAE 4140 steel without nitridation and nitrided

    International Nuclear Information System (INIS)

    Medina F, A.; Naquid G, C.

    2000-01-01

    It was micro structurally characterized an AISI-SAE 4140 steel before and after of nitridation through the nitridation process by plasma post-unloading microwaves through Optical microscopy (OM), Scanning electron microscopy (SEM) by means of secondary electrons and retrodispersed, X-ray diffraction (XRD), Energy dispersion spectra (EDS) and mapping of elements. (Author)

  10. Duplex surface treatment of AISI 1045 steel via plasma nitriding of chromized layer

    International Nuclear Information System (INIS)

    Hakami, F.; Sohi, M. Heydarzadeh; Ghani, J. Rasizadeh

    2011-01-01

    In this work AISI 1045 steel were duplex treated via plasma nitriding of chromized layer. Samples were pack chromized by using a powder mixture consisting of ferrochromium, ammonium chloride and alumina at 1273 K for 5 h. The samples were then plasma-nitrided for 5 h at 803 K and 823 K, in a gas mixture of 75%N 2 + 25%H 2 . The treated specimens were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD) analysis and Vickers micro-hardness test. The thickness of chromized layer before nitriding was about 8 μm and it was increased after plasma nitriding. According to XRD analysis, the chromized layer was composed of chromium and iron carbides. Plasma nitriding of chromized layer resulted in the formation of chromium and iron nitrides and carbides. The hardness of the duplex layers was significantly higher than the hardness of the base material or chromized layer. The main cause of the large improvement in surface hardness was due to the formation of Cr x N and Fe x N phases in the duplex treated layers. Increasing of nitriding temperature from 803 to 823 K enhanced the formation of CrN in the duplex treated layer and increased the thickness of the nitrided layer.

  11. Surface Texturing-Plasma Nitriding Duplex Treatment for Improving Tribological Performance of AISI 316 Stainless Steel

    Directory of Open Access Journals (Sweden)

    Naiming Lin

    2016-10-01

    Full Text Available Surface texturing-plasma nitriding duplex treatment was conducted on AISI 316 stainless steel to improve its tribological performance. Tribological behaviors of ground 316 substrates, plasma-nitrided 316 (PN-316, surface-textured 316 (ST-316, and duplex-treated 316 (DT-316 in air and under grease lubrication were investigated using a pin-on-disc rotary tribometer against counterparts of high carbon chromium bearing steel GCr15 and silicon nitride Si3N4 balls. The variations in friction coefficient, mass loss, and worn trace morphology of the tested samples were systemically investigated and analyzed. The results showed that a textured surface was formed on 316 after electrochemical processing in a 15 wt % NaCl solution. Grooves and dimples were found on the textured surface. As plasma nitriding was conducted on a 316 substrate and ST-316, continuous and uniform nitriding layers were successfully fabricated on the surfaces of the 316 substrate and ST-316. Both of the obtained nitriding layers presented thickness values of more than 30 μm. The nitriding layers were composed of iron nitrides and chromium nitride. The 316 substrate and ST-316 received improved surface hardness after plasma nitriding. When the tribological tests were carried out under dry sliding and grease lubrication conditions, the tested samples showed different tribological behaviors. As expected, the DT-316 samples revealed the most promising tribological properties, reflected by the lowest mass loss and worn morphologies. The DT-316 received the slightest damage, and its excellent tribological performance was attributed to the following aspects: firstly, the nitriding layer had high surface hardness; secondly, the surface texture was able to capture wear debris, store up grease, and then provide continuous lubrication.

  12. Pyrolysis of methane in flowing microwave plasma. Pt. 1, 2

    International Nuclear Information System (INIS)

    Carmi, U.; Inor, A.A.; Avni, R.; Nickel, H.

    1978-04-01

    The flowing microwave (2.45 G Hz) plasmas of methane and methane-argon mixtures were analyzed by the electrical double floating probe system (DFPS), along the flow stream. The measured electric variables of the microwave plasma were: current, current density, electric field strength, electron temperature, positive ion and electron concentrations. They indicate an irreversible process, of the polymerization of CH 4 and CH 4 +Ar mixtures, taking place in the plasma. The polymerization process reaches its maximum 'down stream'. after the position of the microwave cavity. The polymerization was correlated to the concentration of ions and electrons in the plasma. (orig.) [de

  13. Enhanced microwave absorption properties of graphite nanoflakes by coating hexagonal boron nitride nanocrystals

    KAUST Repository

    Zhong, Bo; Liu, Wei; Yu, Yuanlie; Xia, Long; Zhang, Jiulin; Chai, Zhenfei; Wen, Guangwu

    2017-01-01

    We report herein the synthesis of a novel hexagonal boron nitride nanocrystal/graphite nanoflake (h-BNNC/GNF) composite through a wet-chemistry coating of graphite nanoflakes and subsequent in-situ thermal treatment process. The characterization results of X-ray diffraction, scanning electron microscope, transmission electron microscope, energy dispersive X-ray spectrum, and X-ray photoelectron spectroscopy demonstrate that h-BNNCs with diameter of tens of nanometers are highly crystallized and anchored on the surfaces of graphite nanoflakes without obvious aggregation. The minimum reflection loss (RL) value of the h-BNNC/GNF based absorbers could reach −32.38dB (>99.99% attenuation) with the absorber thickness of 2.0mm. This result is superior to the other graphite based and some dielectric loss microwave absorption materials recently reported. Moreover, the frequency range where the RL is less than −10dB is 3.49-17.28GHz with the corresponding thickness of 5.0 to 1.5mm. This reveals a better electromagnetic microwave absorption performance of h-BNNC/GNFs from the X-band to the Ku-band. The remarkable enhancement of the electromagnetic microwave absorption properties of h-BNNC/GNFs can be assigned to the increase of multiple scattering, interface polarization as well as the improvement of the electromagnetic impedance matching of graphite nanoflakes after being coated with h-BNNCs.

  14. Enhanced microwave absorption properties of graphite nanoflakes by coating hexagonal boron nitride nanocrystals

    KAUST Repository

    Zhong, Bo

    2017-05-31

    We report herein the synthesis of a novel hexagonal boron nitride nanocrystal/graphite nanoflake (h-BNNC/GNF) composite through a wet-chemistry coating of graphite nanoflakes and subsequent in-situ thermal treatment process. The characterization results of X-ray diffraction, scanning electron microscope, transmission electron microscope, energy dispersive X-ray spectrum, and X-ray photoelectron spectroscopy demonstrate that h-BNNCs with diameter of tens of nanometers are highly crystallized and anchored on the surfaces of graphite nanoflakes without obvious aggregation. The minimum reflection loss (RL) value of the h-BNNC/GNF based absorbers could reach −32.38dB (>99.99% attenuation) with the absorber thickness of 2.0mm. This result is superior to the other graphite based and some dielectric loss microwave absorption materials recently reported. Moreover, the frequency range where the RL is less than −10dB is 3.49-17.28GHz with the corresponding thickness of 5.0 to 1.5mm. This reveals a better electromagnetic microwave absorption performance of h-BNNC/GNFs from the X-band to the Ku-band. The remarkable enhancement of the electromagnetic microwave absorption properties of h-BNNC/GNFs can be assigned to the increase of multiple scattering, interface polarization as well as the improvement of the electromagnetic impedance matching of graphite nanoflakes after being coated with h-BNNCs.

  15. Plasma nitriding of a precipitation hardening stainless steel to improve erosion and corrosion resistance

    International Nuclear Information System (INIS)

    Cabo, Amado; Bruhl, Sonia P.; Vaca, Laura S.; Charadia, Raul Charadia

    2010-01-01

    Precipitation hardening stainless steels are used as structural materials in the aircraft and the chemical industry because of their good combination of mechanical and corrosion properties. The aim of this work is to analyze the structural changes produced by plasma nitriding in the near surface of Thyroplast PH X Supra®, a PH stainless steel from ThyssenKrupp, and to study the effect of nitriding parameters in wear and corrosion resistance. Samples were first aged and then nitriding was carried out in an industrial facility at two temperatures, with two different nitrogen partial pressures in the gas mixture. After nitriding, samples were cut, polished, mounted in resin and etched with Vilella reagent to reveal the nitrided case. Nitrided structure was also analyzed with XRD. Erosion/Corrosion was tested against sea water and sand flux, and corrosion in a salt spray fog (ASTM B117). All nitrided samples presented high hardness. Samples nitrided at 390 deg C with different nitrogen partial pressure showed similar erosion resistance against water and sand flux. The erosion resistance of the nitrided samples at 500 deg C was the highest and XRD revealed nitrides. Corrosion resistance, on the contrary, was diminished; the samples suffered of general corrosion during the salt spray fog test. (author)

  16. Metallurgical response of an AISI 4140 steel to different plasma nitriding gas mixtures

    Directory of Open Access Journals (Sweden)

    Adão Felipe Oliveira Skonieski

    2013-01-01

    Full Text Available Plasma nitriding is a surface modification process that uses glow discharge to diffuse nitrogen atoms into the metallic matrix of different materials. Among the many possible parameters of the process, the gas mixture composition plays an important role, as it impacts directly the formed layer's microstructure. In this work an AISI 4140 steel was plasma nitrided under five different gas compositions. The plasma nitriding samples were characterized using optical and scanning electron microscopy, microhardness test, X-ray diffraction and GDOES. The results showed that there are significant microstructural and morphological differences on the formed layers depending on the quantity of nitrogen and methane added to the plasma nitriding atmosphere. Thicknesses of 10, 5 and 2.5 µm were obtained when the nitrogen content of the gas mixtures were varied. The possibility to obtain a compound layer formed mainly by γ'-Fe4N nitrides was also shown. For all studied plasma nitriding conditions, the presence of a compound layer was recognized as being the responsible to hinder the decarburization on the steel surface. The highest value of surface hardness - 1277HV - were measured in the sample which were nitrided with 3vol.% of CH4.

  17. Plasma nitriding of AISI 52100 ball bearing steel and effect of heat ...

    Indian Academy of Sciences (India)

    ††National Engineering Industries Pvt. Ltd., Jaipur 302 006, India. MS received 26 April ... hardened and tempered with spheroidized carbides is the most commonly used mate- ... because they are polluting the environment. Plasma nitrid-.

  18. An experimental facility for microwave induced plasma processing of materials

    International Nuclear Information System (INIS)

    Patil, D.S.; Ramachandran, K.; Bhide, A.L.; Venkatramani, N.

    1997-01-01

    Microwave induced plasma processing offers many advantages over conventional processes. However this technology is in the development stage. This report gives a detailed information about a microwave plasma processing facility (2.45 GHz, 700 W) set up in the Laser and Plasma Technology Division. The equipment details and the results obtained on deposition of diamond like carbon (DLC) thin films and surface modification of polymer PET (polyethylene terephthalate) using this facility are given in this report. (author)

  19. Skin effect of microwaves and transverse pseudowaves in plasmas

    International Nuclear Information System (INIS)

    Minami, Kazuo

    1977-09-01

    Using linearized Vlasov-Maxwell equations, the skin effect of microwaves and transverse pseudowaves excited by an idealized grid antenna in plasmas are analyzed. It is shown that the latter is predominant over the former, in such a plasma that ω sub(p) v sub(t)/ωc >= 1, where ω sub(p) and ω are the plasma and microwave angular frequencies, v sub(t) and c are the electron thermal and light velocities, respectively. (auth.)

  20. Spectroscopic investigation of wave driven microwave plasmas

    International Nuclear Information System (INIS)

    Wijtvliet, R.; Felizardo, E.; Tatarova, E.; Dias, F. M.; Ferreira, C. M.; Nijdam, S.; Veldhuizen, E. V.; Kroesen, G.

    2009-01-01

    Large H atom line broadening was found throughout the volume of surface wave generated He-H 2 and H 2 microwave plasmas at low pressures. The measured Doppler temperatures corresponding to the H β , H γ , H δ , H ε , and H ζ line profiles were found to be higher than the rotational temperature of the hydrogen molecular Fulcher-α band and the Doppler temperature of the 667.1 nm singlet He line. No excessive broadening has been found. The Lorentzian and Gaussian widths as determined by fitting the spectral lines with a Voigt profile increase with the principal quantum number of the upper level. In contrast, no such dependence for the Gaussian width has been observed in an Ar-H 2 discharge. No population inversion has been observed from measurements of the relative intensities of transitions within the Balmer series.

  1. Imaging the p-n junction in a gallium nitride nanowire with a scanning microwave microscope

    Energy Technology Data Exchange (ETDEWEB)

    Imtiaz, Atif [Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, Colorado 80305 (United States); Department of Electrical, Computer, and Energy Engineering, University of Colorado, Boulder, Colorado 80309 (United States); Wallis, Thomas M.; Brubaker, Matt D.; Blanchard, Paul T.; Bertness, Kris A.; Sanford, Norman A.; Kabos, Pavel, E-mail: kabos@boulder.nist.gov [Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, Colorado 80305 (United States); Weber, Joel C. [Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, Colorado 80305 (United States); Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309 (United States); Coakley, Kevin J. [Information Technology Laboratory, National Institute of Standards and Technology, Boulder, Colorado 80305 (United States)

    2014-06-30

    We used a broadband, atomic-force-microscope-based, scanning microwave microscope (SMM) to probe the axial dependence of the charge depletion in a p-n junction within a gallium nitride nanowire (NW). SMM enables the visualization of the p-n junction location without the need to make patterned electrical contacts to the NW. Spatially resolved measurements of S{sub 11}{sup ′}, which is the derivative of the RF reflection coefficient S{sub 11} with respect to voltage, varied strongly when probing axially along the NW and across the p-n junction. The axial variation in S{sub 11}{sup ′}  effectively mapped the asymmetric depletion arising from the doping concentrations on either side of the junction. Furthermore, variation of the probe tip voltage altered the apparent extent of features associated with the p-n junction in S{sub 11}{sup ′} images.

  2. [Study on the emission spectrum of microwave plasma in liquid].

    Science.gov (United States)

    Wang, Bo; Sun, Bing; Zhu, Xiao-Mei; Yan, Zhi-Yu; Liu, Yong-Jun; Liu, Hui

    2014-05-01

    After the technology of microwave discharge in liquid is realized for the first time in China, the basic physical phenomena and characteristic of microwave discharge in liquid is studied in order to lay a theoretical foundation of research on microwave discharge in liquid. In the present paper, the active particles generated by microwave discharge in liquid were detected using the emission spectrometer, and the statistical method of spectrum data of microwave discharge in liquid was also studied. The emission spectrometer and numerically controlled camera were used to detect synchronously the process of the initial discharge and stable discharge of microwave discharge in liquid. The results show that: the emission intensity of microwave plasma in liquid has a large fluctuation, and the spectrum intensity can be calculated using the average of 10 spectrum data points. The intensity of discharge is reflected by the plasma area in a certain extent, however, the variation gradient of the intensity of discharge is different from that of the plasma area. This is mainly because that, in the process of discharging, the discharge intensity is not only reflected by the plasma area, but also reflected by the brightness of the plasma.

  3. Advancements of microwave diagnostics in magnetically confined plasmas

    NARCIS (Netherlands)

    Mase, A.; Kogi, Y.; Ito, N.; Yokota, Y.; Akaki, K.; Kawahata, K.; Nagayama, Y.; Tokuzawa, T.; Yamaguchi, S.; Hojo, H.; Oyama, N.; N C Luhmann Jr.,; Park, H. K.; Donne, A. J. H.

    2009-01-01

    Microwave to millimeter-wave diagnostic techniques such as interferometry, reflectometry, scattering and radiometry have been powerful tools for diagnosing magnetically confined plasmas. Recent advances in electronic devices and components together with computer technology have enabled the

  4. Microwave imaging for plasma diagnostics and its applications

    International Nuclear Information System (INIS)

    Mase, A.; Kogi, Y.; Ito, N.

    2007-01-01

    Microwave to millimeter-wave diagnostic techniques such as interferometry, reflectometry, scattering, and radiometry have been powerful tools for diagnosing magnetically confined plasmas. Important plasma parameters were measured to clarify the physics issues such as stability, wave phenomena, and fluctuation-induced transport. Recent advances in microwave and millimeter-wave technology together with computer technology have enabled the development of advanced diagnostics for visualization of 2D and 3D structures of plasmas. Microwave/millimeter-wave imaging is expected to be one of the most promising diagnostic methods for this purpose. We report here on the representative microwave diagnostics and their industrial applications as well as application to magnetically-confined plasmas. (author)

  5. Development of a long-slot microwave plasma source

    Energy Technology Data Exchange (ETDEWEB)

    Kuwata, Y., E-mail: euo1304@mail4.doshisha.ac.jp; Kasuya, T.; Miyamoto, N.; Wada, M. [Graduate School of Science and Engineering, Doshisha University, Kyotanabe, Kyoto 610-0321 (Japan)

    2016-02-15

    A 20 cm long 10 cm wide microwave plasma source was realized by inserting two 20 cm long 1.5 mm diameter rod antennas into the plasma. Plasma luminous distributions around the antennas were changed by magnetic field arrangement created by permanent magnets attached to the source. The distributions appeared homogeneous in one direction along the antenna when the spacing between the antenna and the source wall was 7.5 mm for the input microwave frequency of 2.45 GHz. Plasma density and temperature at a plane 20 cm downstream from the microwave shield were measured by a Langmuir probe array at 150 W microwave power input. The measured electron density and temperature varied over space from 3.0 × 10{sup 9} cm{sup −3} to 5.8 × 10{sup 9} cm{sup −3}, and from 1.1 eV to 2.1 eV, respectively.

  6. Effect of plasma nitriding time on surface properties of hard chromium electroplated AISI 1010 steel

    International Nuclear Information System (INIS)

    Kocabas, Mustafa; Uelker, Suekrue

    2015-01-01

    Properties of steel can be enhanced by surface treatments such as coating. In some cases, further treatments such as nitriding can also be used in order to get even better results. In order to investigate the properties of nitride layer on hard Cr coated AISI 1010 steel, substrates were electroplated to form hard Cr coatings. Then hard Cr coatings were plasma nitrided at 700 C for 3 h, 5 h and 7 h and nitride phases on the coatings were investigated by X-ray diffraction analysis. The layer thickness and surface properties of nitride films were investigated by scanning electron microscopy. The hardness and adhesion properties of Cr-N phases were examined using nano indentation and Daimler-Benz Rockwell C adhesion tests. The highest measured hardness was 24.1 GPa and all the three samples exhibited poor adhesion.

  7. Effect of plasma nitriding time on surface properties of hard chromium electroplated AISI 1010 steel

    Energy Technology Data Exchange (ETDEWEB)

    Kocabas, Mustafa [Yildiz Technical Univ., Istanbul (Turkey). Metallurgical and Materials Engineering Dept.; Danisman, Murat [Gedik Univ., Istanbul (Turkey). Electrical and Electronic Engineering Dept.; Cansever, Nurhan [Yildiz Technical Univ., Istanbul (Turkey); Uelker, Suekrue [Afyon Kocatepe Univ. (Turkey). Dept. of Mechanical Engineering

    2015-06-01

    Properties of steel can be enhanced by surface treatments such as coating. In some cases, further treatments such as nitriding can also be used in order to get even better results. In order to investigate the properties of nitride layer on hard Cr coated AISI 1010 steel, substrates were electroplated to form hard Cr coatings. Then hard Cr coatings were plasma nitrided at 700 C for 3 h, 5 h and 7 h and nitride phases on the coatings were investigated by X-ray diffraction analysis. The layer thickness and surface properties of nitride films were investigated by scanning electron microscopy. The hardness and adhesion properties of Cr-N phases were examined using nano indentation and Daimler-Benz Rockwell C adhesion tests. The highest measured hardness was 24.1 GPa and all the three samples exhibited poor adhesion.

  8. Recent Advancements in Microwave Imaging Plasma Diagnostics

    International Nuclear Information System (INIS)

    Park, H.; Chang, C.C.; Deng, B.H.; Domier, C.W.; Donni, A.J.H.; Kawahata, K.; Liang, C.; Liang, X.P.; Lu, H.J.; Luhmann, N.C. Jr.; Mase, A.; Matsuura, H.; Mazzucato, E.; Miura, A.; Mizuno, K.; Munsat, T.; Nagayama, K.; Nagayama, Y.; Pol, M.J. van de; Wang, J.; Xia, Z.G.; Zhang, W-K.

    2002-01-01

    Significant advances in microwave and millimeter wave technology over the past decade have enabled the development of a new generation of imaging diagnostics for current and envisioned magnetic fusion devices. Prominent among these are revolutionary microwave electron cyclotron emission imaging (ECEI), microwave phase imaging interferometers, imaging microwave scattering and microwave imaging reflectometer (MIR) systems for imaging electron temperature and electron density fluctuations (both turbulent and coherent) and profiles (including transport barriers) on toroidal devices such as tokamaks, spherical tori, and stellarators. The diagnostic technology is reviewed, and typical diagnostic systems are analyzed. Representative experimental results obtained with these novel diagnostic systems are also presented

  9. Active screen plasma nitriding enhances cell attachment to polymer surfaces

    International Nuclear Information System (INIS)

    Kaklamani, Georgia; Bowen, James; Mehrban, Nazia; Dong, Hanshan; Grover, Liam M.; Stamboulis, Artemis

    2013-01-01

    Active screen plasma nitriding (ASPN) is a well-established technique used for the surface modification of materials, the result of which is often a product with enhanced functional performance. Here we report the modification of the chemical and mechanical properties of ultra-high molecular weight poly(ethylene) (UHMWPE) using 80:20 (v/v) N 2 /H 2 ASPN, followed by growth of 3T3 fibroblasts on the treated and untreated polymer surfaces. ASPN-treated UHMWPE showed extensive fibroblast attachment within 3 h of seeding, whereas fibroblasts did not successfully attach to untreated UHMWPE. Fibroblast-coated surfaces were maintained for up to 28 days, monitoring their metabolic activity and morphology throughout. The chemical properties of the ASPN-treated UHMWPE surface were studied using X-ray photoelectron spectroscopy, revealing the presence of C-N, C=N, and C≡N chemical bonds. The elastic modulus, surface topography, and adhesion properties of the ASPN-treated UHMWPE surface were studied over 28 days during sample storage under ambient conditions and during immersion in two commonly used cell culture media.

  10. Nitriding the influence of plasma in resistance to wear micro abrasive tool steel AISI D2

    International Nuclear Information System (INIS)

    Gobbi, Vagner Joao; Gobb, Silvio Jose; Silva, Cosme Roberto Moreira da

    2010-01-01

    This work studies the influence of time of treatment in the formation of nitride layer of AISI D2 tool steel and the resistance to micro-abrasive wear from the technique of nitriding in plasma. The samples were nitrides at 400 ° C with a pressure of 4.5 mbar (450 Pa) and using a gas mixture of 80% vol.H2 and 20% vol.N2. The times of treatment were: 30, 60, 120, 180 and 360 minutes. The properties of the layers in the samples obtained nitrides were assessed by surface microhardness, profiles of microhardness, metallography analysis, X-ray diffraction and test for resistance to micro-abrasive wear. The best results for nitriding to 400 deg C, was obtained with the time of treatment of 360 minutes. In this case the increase in surface hardness was 94.6% and resistance to micro-abrasive wear of 15%. This increase in hardness may be associated with high concentration of nitrogen in the crystalline network of iron-α and additional training of nitrides. Low temperature of nitriding reduces between grain fragility to reduce the likelihood of precipitation of nitrides in a continuous manner in the austenite grain boundaries and the absence of previous ε'+ γ phases. (author)

  11. Structure and electrochemical properties of plasma-nitrided low alloy steel

    Energy Technology Data Exchange (ETDEWEB)

    Chyou, S.D.; Shih, H.C. (Dept. of Materials Science and Engineering, National Tsing Hua Univ., Hsinchu (Taiwan))

    1990-10-01

    Plasma-nitrided SAE 4140 steel has been widely applied industrially because of its superior resistance to wear and fatigue. However, its corrosion behaviour in aqueous environments has not been completely explored. The effects of nitriding on corrosion were investigated by performing electrochemical tests on both nitrided and untreated SAE 4140. It was found that, by plasma nitriding, the corrosion resistance improved significantly in HNO{sub 3} and Na{sub 2}SO{sub 4} aqueous environments. A reaction model is proposed to explain the beneficial effect of nitride on corrosion resistance. It is concluded that nitrogen and chromium (an alloying element) act synergistically to form a dense protective layer which is responsible for the corrosion resistance. Characterization of the surface layers by Auger electron spectroscopy and X-ray photoelectron spectroscopy reveals that the protective layer is composed of (Fe, Cr){sub 4}N, (Fe, Cr){sub 2-3}N and CrN in the inner layer, Fe{sub 2}O{sub 3}, Cr{sub 2}O{sub 3} together with nitrides in the middle layer, and nitrides, {gamma}'-FeOOH, and Cr(OH){sub 3}.H{sub 2}O in the outermost layer. (orig.).

  12. a Novel Method for Improving Plasma Nitriding Efficiency: Pre-Magnetization by DC Magnetic Field

    Science.gov (United States)

    Kovaci, Halim; Yetim, Ali Fatih; Bozkurt, Yusuf Burak; Çelik, Ayhan

    2017-06-01

    In this study, a novel pre-magnetization process, which enables easy diffusion of nitrogen, was used to enhance plasma nitriding efficiency. Firstly, magnetic fields with intensities of 1500G and 2500G were applied to the untreated samples before nitriding. After the pre-magnetization, the untreated and pre-magnetized samples were plasma nitrided for 4h in a gas mixture of 50% N2-50% H2 at 500∘C and 600∘C. The structural, mechanical and morphological properties of samples were examined by X-ray diffraction (XRD), scanning electron microscopy (SEM), microhardness tester and surface tension meter. It was observed that pre-magnetization increased the surface energy of the samples. Therefore, both compound and diffusion layer thicknesses increased with pre-magnetization process before nitriding treatment. As modified layer thickness increased, higher surface hardness values were obtained.

  13. Nitridation Of The A A 2024 T3 Aluminium By The Glow Discharge Plasma Technique

    International Nuclear Information System (INIS)

    Mudjiman, Supardjono; Sujitno, Tjipto; Sudjatmoko

    1996-01-01

    Nitridation of A A 2024 T3 aluminium by means of plasma glow discharge technique has been carried out. For this purpose, the experiments were carried out at the temperature 30 o C, 60 o C, 100 o C, 150 o C, 200 o C, and 250 o C whereas the nitridation time were varied at 5 minutes, 15 minutes, 40 minutes, 90 minutes and 180 minutes. The results showed that the optimum temperature and time of nitridation were 60 o C and 90 minutes respectively and the hardness increased from 115 to 166 KHN

  14. Electronic structure and mechanical properties of plasma nitrided ferrous alloys

    Energy Technology Data Exchange (ETDEWEB)

    Portolan, E. [Centro de Ciencias Exatas e Tecnologia, Universidade de Caxias do Sul, 95070-560 Caxias do Sul-RS (Brazil); Baumvol, I.J.R. [Centro de Ciencias Exatas e Tecnologia, Universidade de Caxias do Sul, 95070-560 Caxias do Sul-RS (Brazil); Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre 91509-970 (Brazil); Figueroa, C.A., E-mail: cafiguer@ucs.br [Centro de Ciencias Exatas e Tecnologia, Universidade de Caxias do Sul, 95070-560 Caxias do Sul-RS (Brazil)

    2009-04-15

    The electronic structures of the near-surface regions of two different nitrided steels (AISI 316 and 4140) were investigated using X-ray photoelectron spectroscopy. Photoelectron groups from all main chemical elements involved were addressed for steel samples with implanted-N concentrations in the range 16-32 at.%. As the implanted-N concentrations were increased, rather contrasting behaviors were observed for the two kinds of steel. The N1s photoelectrons had spectral shifts toward lower (nitrided AISI 316) or higher (nitrided AISI 4140) binding energies, whereas the Fe2p{sub 3/2} photoelectron spectrum remains at a constant binding energy (nitrided AISI 316) or shifts toward higher binding energies (AISI 4140). These trends are discussed in terms of the metallic nitride formation and the overlapping of atomic orbitals. For nitrided AISI 316, a semi-classical approach of charge transfer between Cr and N is used to explain the experimental facts (formation of CrN), while for nitrided AISI 4140 we propose that the interaction between orbitals 4s from Fe and 2p from N promotes electrons to the conduction band increasing the electrical attraction of the N1s and Fe2p electrons in core shells (formation of FeN{sub x}). The increase in hardness of the steel upon N implantation is attributed to the localization of electrons in specific bonds, which diminishes the metallic bond character.

  15. Electronic structure and mechanical properties of plasma nitrided ferrous alloys

    Science.gov (United States)

    Portolan, E.; Baumvol, I. J. R.; Figueroa, C. A.

    2009-04-01

    The electronic structures of the near-surface regions of two different nitrided steels (AISI 316 and 4140) were investigated using X-ray photoelectron spectroscopy. Photoelectron groups from all main chemical elements involved were addressed for steel samples with implanted-N concentrations in the range 16-32 at.%. As the implanted-N concentrations were increased, rather contrasting behaviors were observed for the two kinds of steel. The N1s photoelectrons had spectral shifts toward lower (nitrided AISI 316) or higher (nitrided AISI 4140) binding energies, whereas the Fe2p 3/2 photoelectron spectrum remains at a constant binding energy (nitrided AISI 316) or shifts toward higher binding energies (AISI 4140). These trends are discussed in terms of the metallic nitride formation and the overlapping of atomic orbitals. For nitrided AISI 316, a semi-classical approach of charge transfer between Cr and N is used to explain the experimental facts (formation of CrN), while for nitrided AISI 4140 we propose that the interaction between orbitals 4s from Fe and 2p from N promotes electrons to the conduction band increasing the electrical attraction of the N1s and Fe2p electrons in core shells (formation of FeN x). The increase in hardness of the steel upon N implantation is attributed to the localization of electrons in specific bonds, which diminishes the metallic bond character.

  16. Electronic structure and mechanical properties of plasma nitrided ferrous alloys

    International Nuclear Information System (INIS)

    Portolan, E.; Baumvol, I.J.R.; Figueroa, C.A.

    2009-01-01

    The electronic structures of the near-surface regions of two different nitrided steels (AISI 316 and 4140) were investigated using X-ray photoelectron spectroscopy. Photoelectron groups from all main chemical elements involved were addressed for steel samples with implanted-N concentrations in the range 16-32 at.%. As the implanted-N concentrations were increased, rather contrasting behaviors were observed for the two kinds of steel. The N1s photoelectrons had spectral shifts toward lower (nitrided AISI 316) or higher (nitrided AISI 4140) binding energies, whereas the Fe2p 3/2 photoelectron spectrum remains at a constant binding energy (nitrided AISI 316) or shifts toward higher binding energies (AISI 4140). These trends are discussed in terms of the metallic nitride formation and the overlapping of atomic orbitals. For nitrided AISI 316, a semi-classical approach of charge transfer between Cr and N is used to explain the experimental facts (formation of CrN), while for nitrided AISI 4140 we propose that the interaction between orbitals 4s from Fe and 2p from N promotes electrons to the conduction band increasing the electrical attraction of the N1s and Fe2p electrons in core shells (formation of FeN x ). The increase in hardness of the steel upon N implantation is attributed to the localization of electrons in specific bonds, which diminishes the metallic bond character.

  17. Low temperature high density plasma nitriding of stainless steel molds for stamping of oxide glasses

    Directory of Open Access Journals (Sweden)

    Aizawa Tatsuhiko

    2016-01-01

    Full Text Available Various kinds of stainless steels have been widely utilized as a die for mold- and direct-stamping processes of optical oxide glasses. Since they suffered from high temperature transients and thermal cycles in practice, they must be surface-treated by dry and wet coatings, or, by plasma nitriding. Martensitic stainless steel mold was first wet plated by the nickel phosphate (NiP, which was unstable at the high temperature stamping condition; and, was easy to crystalize or to fracture by itself. This issue of nuisance significantly lowered the productivity in fabrication of optical oxide-glass elements. In the present paper, the stainless steel mold was surface-treated by the low-temperature plasma nitriding. The nitrided layer by this surface modification had higher nitrogen solute content than 4 mass%; the maximum solid-solubility of nitrogen is usually 0.1 mass% in the equilibrium phase diagram. Owing to this solid-solution with high nitrogen concentration, the nitrided layer had high hardness over 1400 HV within its thickness of 50 μm without any formation of nitrides after plasma nitriding at 693 K for 14.4 ks. This plasma-nitrided mold was utilized for mold-stamping of two colored oxide glass plates at 833 K; these plates were successfully deformed and joined into a single glass plate by this stamping without adhesion or galling of oxide glasses onto the nitrided mold surface.

  18. Degradation of nitride coatings in low-pressure gas discharge plasma

    Science.gov (United States)

    Ivanov, Yurii; Shugurov, Vladimir; Krysina, Olga; Petrikova, Elizaveta; Tolkachev, Oleg

    2017-12-01

    The paper provides research data on the defect structure, mechanical characteristics, and tribological properties of commercially pure VT1-0 titanium exposed to surface modification on a COMPLEX laboratory electron-ion plasma setup which allows nitriding, coating deposition, and etching in low-pressure gas discharge plasma in a single vacuum cycle. It is shown that preliminary plasma nitriding forms a columnar Ti2N phase in VT1-0 titanium and that subsequent TiN deposition results in a thin nanocrystalline TiN layer. When the coating-substrate system is etched, the coating fails and the tribological properties of the material degrade greatly.

  19. Structural materialization of stainless steel molds and dies by the low temperature high density plasma nitriding

    Directory of Open Access Journals (Sweden)

    Aizawa Tatsuhiko

    2015-01-01

    Full Text Available Various kinds of stainless steels have been widely utilized as a mold substrate material for injection molding and as a die for mold-stamping and direct stamping processes. Since they suffered from high temperature transients and thermal cycles in practice, they must be surface-treated by dry and wet coatings, or, by plasma nitriding. Martensitic stainless steel mold was first wet plated by the nickel phosphate (NiP, which was unstable at the high temperature stamping condition; and, was easy to crystalize or to fracture by itself. This issue of nuisance significantly lowered the productivity in fabrication of optical elements at present. In the present paper, the stainless steel mold was surface-treated by the low-temperature plasma nitriding. The nitrided layer by this surface modification had higher nitrogen solute content than 4 mass%; the maximum solid-solubility of nitrogen is usually 0.1 mass% in the equilibrium phase diagram. Owing to this solid-solution with high nitrogen concentration, the nitrided layer had high hardness of 1400 Hv within its thickness of 40 μm without any formation of nitrides after 14.4 ks plasma nitriding at 693 K. This nitrogen solid-solution treated stainless steel had thermal resistivity even at the mold-stamping conditions up to 900 K.

  20. Rolling Contact Fatigue Failure Mechanisms of Plasma-Nitrided Ductile Cast Iron

    Science.gov (United States)

    Wollmann, D.; Soares, G. P. P. P.; Grabarski, M. I.; Weigert, N. B.; Escobar, J. A.; Pintaude, G.; Neves, J. C. K.

    2017-05-01

    Rolling contact fatigue (RCF) of a nitrided ductile cast iron was investigated. Flat washers machined from a pearlitic ductile cast iron bar were quenched and tempered to maximum hardness, ground, polished and divided into four groups: (1) specimens tested as quenched and tempered; (2) specimens plasma-nitrided for 8 h at 400 °C; (3) specimens plasma-nitrided and submitted to a diffusion process for 16 h at 400 °C; and (4) specimens submitted to a second tempering for 24 h at 400 °C. Hardness profiles, phase analyses and residual stress measurements by x-ray diffraction, surface roughness and scanning electron microscopy were applied to characterize the surfaces at each step of this work. Ball-on-flat washer tests were conducted with a maximum contact pressure of 3.6 GPa, under flood lubrication with a SAE 90 API GL-5 oil at 50 °C. Test ending criterion was the occurrence of a spalling. Weibull analysis was used to characterize RCF's lifetime data. Plasma-nitrided specimens exhibited a shorter RCF lifetime than those just quenched and tempered. The effects of nitriding on the mechanical properties and microstructure of the ductile cast iron are discussed in order to explain the shorter endurance of nitrided samples.

  1. Titanium nitride plasma-chemical synthesis with titanium tetrachloride raw material in the DC plasma-arc reactor

    Science.gov (United States)

    Kirpichev, D. E.; Sinaiskiy, M. A.; Samokhin, A. V.; Alexeev, N. V.

    2017-04-01

    The possibility of plasmochemical synthesis of titanium nitride is demonstrated in the paper. Results of the thermodynamic analysis of TiCl4 - H2 - N2 system are presented; key parameters of TiN synthesis process are calculated. The influence of parameters of plasma-chemical titanium nitride synthesis process in the reactor with an arc plasmatron on characteristics on the produced powders is experimentally investigated. Structure, chemical composition and morphology dependencies on plasma jet enthalpy, stoichiometric excess of hydrogen and nitrogen in a plasma jet are determined.

  2. Surface improvement and biocompatibility of TiAl{sub 24}Nb{sub 10} intermetallic alloy using rf plasma nitriding

    Energy Technology Data Exchange (ETDEWEB)

    Abd El-Rahman, A.M. [Physics Department, Faculty of Science, Sohag University (Egypt)], E-mail: ahmedphys96@hotmail.com; Maitz, M.F. [Institut fuer Ionenstrahlphysik und Materialforschung, Forschungszentrum Dresden Rossendorf (Germany); Kassem, M.A. [Department of Materials and Metals Engineering, Faculty of Petroleum and Mining Engineering, Suez Canal University (Egypt); El-Hossary, F.M. [Physics Department, Faculty of Science, Sohag University (Egypt); Prokert, F.; Reuther, H.; Pham, M.T.; Richter, E. [Institut fuer Ionenstrahlphysik und Materialforschung, Forschungszentrum Dresden Rossendorf (Germany)

    2007-09-30

    The present work describes the surface improvement and biocompatibility of TiAl{sub 24}Nb{sub 10} intermetallic alloy using rf plasma nitriding. The nitriding process was carried out at different plasma power from 400 W to 650 W where the other plasma conditions were fixed. Grazing incidence X-ray diffractometry (GIXRD), Auger electron spectroscopy (AES), tribometer and a nanohardness tester were employed to characterize the nitrided layer. Further potentiodynamic polarization method was used to describe the corrosion behavior of the un-nitrided and nitrided alloy. It has been found that the Vickers hardness (HV) and corrosion resistance values of the nitrided layers increase with increasing plasma power while the wear rates of the nitrided layers reduce by two orders of magnitude as compared to those of the un-nitrided layer. This improvement in surface properties of the intermetallic alloy is due to formation of a thin modified layer which is composed of titanium nitride in the alloy surface. Moreover, all modified layers were tested for their sustainability as a biocompatible material. Concerning the application area of biocompatibility, the present treated alloy show good surface properties especially for the nitrided alloy at low plasma power of 400 W.

  3. Recent trends in atomic spectrometry with microwave-induced plasmas

    International Nuclear Information System (INIS)

    Broekaert, Jose A.C.; Siemens, Volker

    2004-01-01

    The state-of-the-art and trends of development in atomic spectrometry with microwave-induced plasmas (MIPs) since the 1998s are presented and discussed. This includes developments in devices for producing microwave plasma discharges, with reference also to miniaturized systems as well as to progress in sample introduction for microwave-induced plasmas, such as pneumatic and ultrasonic nebulization using membrane desolvation, to the further development of gaseous analyte species generation systems and to both spark and laser ablation (LA). The features of microwave-induced plasma mass spectrometry (MIP-MS) as an alternative to inductively coupled plasma (ICP)-MS are discussed. Recent work on the use of microwave-induced plasma atomic spectrometry for trace element determinations and monitoring, their use as tandem sources and for particle sizing are discussed. Recent applications of the coupling of gas chromatography and MIP atomic spectrometry for the determination of organometallic compounds of heavy metals such as Pb, Hg, Se and Sn are reviewed and the possibilities of trapping for sensitivity enhancement, as required for many applications especially in environmental work, are showed at the hand of citations from the recent literature

  4. Microwave Production of Steady State Large Volume Air Plasmas

    National Research Council Canada - National Science Library

    Brandenburg, John

    1999-01-01

    ...) and these plasmas persist for hundreds of milliseconds after power is turned off. These plasmas can be made in an inexpensive and easy to build apparatus based around a microwave oven operating at approximately 1kW and 2.45GHz...

  5. Effect of Plasma Nitriding Process Conditions on Corrosion Resistance of 440B Martensitic Stainless Steel

    Directory of Open Access Journals (Sweden)

    Łępicka Magdalena

    2014-09-01

    Full Text Available Martensitic stainless steels are used in a large number of various industrial applications, e.g. molds for plastic injections and glass moldings, automotive components, cutting tools, surgical and dental instruments. The improvement of their tribological and corrosion properties is a problem of high interest especially in medical applications, where patient safety becomes a priority. The paper covers findings from plasma nitrided AISI 440B (PN-EN or DIN X90CrMoV18 stainless steel corrosion resistance studies. Conventionally heat treated and plasma nitrided in N2:H2 reaction gas mixture (50:50, 65:35 and 80:20, respectively in two different temperature ranges (380 or 450°C specimens groups were examined. Microscopic observations and electrochemical corrosion tests were performed using a variety of analytical techniques. As obtained findings show, plasma nitriding of AISI 440B stainless steel, regardless of the process temperature, results in reduction of corrosion current density. Nevertheless, applying thermo-chemical process which requires exceeding temperature of about 400°C is not recommended due to increased risk of steel sensitization to intergranular and stress corrosion. According to the results, material ion nitrided in 450°C underwent leaching corrosion processes, which led to significant disproportion in chemical composition of the corroded and corrosion-free areas. The authors suggest further research into corrosion process of plasma nitrided materials and its degradation products.

  6. The effect of surface nanocrystallization on plasma nitriding behaviour of AISI 4140 steel

    Energy Technology Data Exchange (ETDEWEB)

    Li Yang [Department of Materials Science and Engineering, Dalian Maritime University, Institute of Metals and Technology, 1 Linghai Street, Dalian 116026 (China); Wang Liang, E-mail: wlimt@yahoo.com [Department of Materials Science and Engineering, Dalian Maritime University, Institute of Metals and Technology, 1 Linghai Street, Dalian 116026 (China); Zhang Dandan; Shen Lie [Department of Materials Science and Engineering, Dalian Maritime University, Institute of Metals and Technology, 1 Linghai Street, Dalian 116026 (China)

    2010-11-15

    A plastic deformation surface layer with nanocrystalline grains was produced on AISI 4140 steel by means of surface mechanical attrition treatment (SMAT). Plasma nitriding of SMAT and un-SMAT AISI 4140 steel was carried out by a low-frequency pulse excited plasma unit. A series of nitriding experiments has been conducted at temperatures ranging from 380 to 500 deg. C for 8 h in an NH{sub 3} gas. The samples were characterized using X-ray diffraction, scanning electron microscopy, optical microscopy and Vickers microhardness tester. The results showed that a much thicker compound layer with higher hardness was obtained for the SMAT samples when compared with un-SMAT samples after nitriding at the low temperature. In particular, plasma nitriding SMAT AISI 4140 steel at 380 deg. C for 8 h can produced a compound layer of 2.5 {mu}m thickness with very high hardness on the surface, which is similar to un-SMAT samples were plasma nitrided at approximately 430 deg. C within the same time.

  7. The effect of surface nanocrystallization on plasma nitriding behaviour of AISI 4140 steel

    International Nuclear Information System (INIS)

    Li Yang; Wang Liang; Zhang Dandan; Shen Lie

    2010-01-01

    A plastic deformation surface layer with nanocrystalline grains was produced on AISI 4140 steel by means of surface mechanical attrition treatment (SMAT). Plasma nitriding of SMAT and un-SMAT AISI 4140 steel was carried out by a low-frequency pulse excited plasma unit. A series of nitriding experiments has been conducted at temperatures ranging from 380 to 500 deg. C for 8 h in an NH 3 gas. The samples were characterized using X-ray diffraction, scanning electron microscopy, optical microscopy and Vickers microhardness tester. The results showed that a much thicker compound layer with higher hardness was obtained for the SMAT samples when compared with un-SMAT samples after nitriding at the low temperature. In particular, plasma nitriding SMAT AISI 4140 steel at 380 deg. C for 8 h can produced a compound layer of 2.5 μm thickness with very high hardness on the surface, which is similar to un-SMAT samples were plasma nitrided at approximately 430 deg. C within the same time.

  8. The effect of surface nanocrystallization on plasma nitriding behaviour of AISI 4140 steel

    Science.gov (United States)

    Li, Yang; Wang, Liang; Zhang, Dandan; Shen, Lie

    2010-11-01

    A plastic deformation surface layer with nanocrystalline grains was produced on AISI 4140 steel by means of surface mechanical attrition treatment (SMAT). Plasma nitriding of SMAT and un-SMAT AISI 4140 steel was carried out by a low-frequency pulse excited plasma unit. A series of nitriding experiments has been conducted at temperatures ranging from 380 to 500 °C for 8 h in an NH 3 gas. The samples were characterized using X-ray diffraction, scanning electron microscopy, optical microscopy and Vickers microhardness tester. The results showed that a much thicker compound layer with higher hardness was obtained for the SMAT samples when compared with un-SMAT samples after nitriding at the low temperature. In particular, plasma nitriding SMAT AISI 4140 steel at 380 °C for 8 h can produced a compound layer of 2.5 μm thickness with very high hardness on the surface, which is similar to un-SMAT samples were plasma nitrided at approximately 430 °C within the same time.

  9. Manufacturing technology development of plasma/ion nitriding for improvement of hardness of machine components and tools

    International Nuclear Information System (INIS)

    Suprapto; Tjipto Sujitno; Saminto

    2015-01-01

    The manufacturing technology development of plasma/ion nitriding to improve of hardness of machine components and tools has been done. The development of this technology aims to improve device performance plasma nitriding double chamber and conducted with the addition of thermal radiation shield. Testing was done by testing for preheating operation (start-up), test operation for conditions nitriding and test for nitriding process. The results show that: the plasma nitriding device can be operated for nitriding process at the temperature of about 500 °C for 6 hours, using the thermal radiation shield obtained outside wall temperature of about 65 °C and shorten start-up time to about 60 minutes. The use of thermal radiation shield can also improve the efficiency of the electric power supply and increase the operating temperature for nitriding process. Test for nitriding obtained increase of hardness 1.33 times for the original camshaft (genuine parts) and 1.8 times for the imitation camshaft (imitation parts), the results are compared with after the tempering process at a temperature of 600 °C. For sample SS 304 was 2.45 times compared with before nitrided These results indicate that the development of manufacturing technology of plasma/ion nitriding to increase hardness of machine components and tools have been successfully able to increase the hardness, although still need to be optimized. Besides that, these devices can be developed to use for the process of carburizing and carbonitriding. (author)

  10. Nitridation of porous GaAs by an ECR ammonia plasma

    International Nuclear Information System (INIS)

    Naddaf, M; Hullavarad, S S; Ganesan, V; Bhoraskar, S V

    2006-01-01

    The effect of surface porosity of GaAs on the nature of growth of GaN, by use of plasma nitridation of GaAs, has been investigated. Porous GaAs samples were prepared by anodic etching of n-type (110) GaAs wafers in HCl solution. Nitridation of porous GaAs samples were carried out by using an electron-cyclotron resonance-induced ammonia plasma. The formation of mixed phases of GaN was investigated using the grazing angle x-ray diffraction method. A remarkable improvement in the intensity of photoluminescence (PL) compared with that of GaN synthesized by direct nitriding of GaAs surface has been observed. The PL intensity of nitrided porous GaAs at the temperature of 380 deg. C was found to be about two orders of magnitude higher as compared with the directly nitrided GaAs at the temperature of 500 deg. C. The changes in the morphology of nitrided porous GaAs have been investigated using both scanning electron microscopy and atomic force microscopy

  11. Nitridation of porous GaAs by an ECR ammonia plasma

    Energy Technology Data Exchange (ETDEWEB)

    Naddaf, M [Center for Advanced Studies in Material Science and Solid State Physics, University of Pune, Pune 411 007 (India); Department of Physics, Atomic Energy Commission of Syria, PO Box 6091, Damascus (Syrian Arab Republic); Hullavarad, S S [Center for Superconductivity Research, Department of Physics, University of Maryland, College Park, MD 20742 (United States); Ganesan, V [Inter University Consortium, Indore (India); Bhoraskar, S V [Center for Advanced Studies in Material Science and Solid State Physics, University of Pune, Pune 411 007 (India)

    2006-02-15

    The effect of surface porosity of GaAs on the nature of growth of GaN, by use of plasma nitridation of GaAs, has been investigated. Porous GaAs samples were prepared by anodic etching of n-type (110) GaAs wafers in HCl solution. Nitridation of porous GaAs samples were carried out by using an electron-cyclotron resonance-induced ammonia plasma. The formation of mixed phases of GaN was investigated using the grazing angle x-ray diffraction method. A remarkable improvement in the intensity of photoluminescence (PL) compared with that of GaN synthesized by direct nitriding of GaAs surface has been observed. The PL intensity of nitrided porous GaAs at the temperature of 380 deg. C was found to be about two orders of magnitude higher as compared with the directly nitrided GaAs at the temperature of 500 deg. C. The changes in the morphology of nitrided porous GaAs have been investigated using both scanning electron microscopy and atomic force microscopy.

  12. Nitridation of porous GaAs by an ECR ammonia plasma

    Science.gov (United States)

    Naddaf, M.; Hullavarad, S. S.; Ganesan, V.; Bhoraskar, S. V.

    2006-02-01

    The effect of surface porosity of GaAs on the nature of growth of GaN, by use of plasma nitridation of GaAs, has been investigated. Porous GaAs samples were prepared by anodic etching of n-type (110) GaAs wafers in HCl solution. Nitridation of porous GaAs samples were carried out by using an electron-cyclotron resonance-induced ammonia plasma. The formation of mixed phases of GaN was investigated using the grazing angle x-ray diffraction method. A remarkable improvement in the intensity of photoluminescence (PL) compared with that of GaN synthesized by direct nitriding of GaAs surface has been observed. The PL intensity of nitrided porous GaAs at the temperature of 380 °C was found to be about two orders of magnitude higher as compared with the directly nitrided GaAs at the temperature of 500 °C. The changes in the morphology of nitrided porous GaAs have been investigated using both scanning electron microscopy and atomic force microscopy.

  13. Low-temperature plasma nitriding of sintered PIM 316L austenitic stainless steel

    Energy Technology Data Exchange (ETDEWEB)

    Mendes, Aecio Fernando; Scheuer, Cristiano Jose; Joanidis, Ioanis Labhardt; Cardoso, Rodrigo Perito; Mafra, Marcio; Klein, Aloisio Nelmo; Brunatto, Silvio Francisco, E-mail: brunatto@ufpr.br [Universidade Federal do Parana (UFPR), Curitiba, PR (Brazil). Dept. de Engenharia Mecanica. Grupo de Tecnologia de Fabricacao Assistida pro Plasma e Metalurgia do Po

    2014-08-15

    This work reports experimental results on sintered PIM 316L stainless steel low-temperature plasma nitriding. The effect of treatment temperature and time on process kinetics, microstructure and surface characteristics of the nitrided samples were investigated. Nitriding was carried out at temperatures of 350, 380, 410 and 440 °C , and times of 4, 8 and 16 h, using a gas mixture composed by 60% N2 + 20% H2 + 20% Ar, at a gas flow rate of 5.00 X 10{sup 6} Nm{sup 3-1}, and a pressure of 800 Pa. The treated samples were characterized by scanning electron microscopy, X-ray diffractometry and microhardness measurements. Results indicate that low-temperature plasma nitriding is a diffusion controlled process. The calculated activation energy for nitrided layer growth was 111.4 kJmol{sup -1}. Apparently precipitation-free layers were produced in this study. It was also observed that the higher the treatment temperature and time the higher is the obtained surface hardness. Hardness up to 1343 HV{sub 0.025} was verified for samples nitrided at 440 °C. Finally, the characterization of the treated surface indicates the formation of cracks, which were observed in regions adjacent to the original pores after the treatment. (author)

  14. Deposition of titanium nitride layers by electric arc – Reactive plasma spraying method

    International Nuclear Information System (INIS)

    Şerban, Viorel-Aurel; Roşu, Radu Alexandru; Bucur, Alexandra Ioana; Pascu, Doru Romulus

    2013-01-01

    Highlights: ► Titanium nitride layers deposited by electric arc – reactive plasma spraying method. ► Deposition of titanium nitride layers on C45 steel at different spraying distances. ► Characterization of the coatings hardness as function of the spraying distances. ► Determination of the corrosion behavior of titanium nitride layers obtained. - Abstract: Titanium nitride (TiN) is a ceramic material which possesses high mechanical properties, being often used in order to cover cutting tools, thus increasing their lifetime, and also for covering components which are working in corrosive environments. The paper presents the experimental results on deposition of titanium nitride coatings by a new combined method (reactive plasma spraying and electric arc thermal spraying). In this way the advantages of each method in part are combined, obtaining improved quality coatings in the same time achieving high productivity. Commercially pure titanium wire and C45 steel as substrate were used for experiments. X-ray diffraction analysis shows that the deposited coatings are composed of titanium nitride (TiN, Ti 2 N) and small amounts of Ti 3 O. The microstructure of the deposited layers, investigated both by optical and scanning electron microscopy, shows that the coatings are dense, compact, without cracks and with low porosity. Vickers microhardness of the coatings presents maximum values of 912 HV0.1. The corrosion tests in 3%NaCl solution show that the deposited layers have a high corrosion resistance compared to unalloyed steel substrate.

  15. Microwave simulation of laser plasma interactions. Final report

    International Nuclear Information System (INIS)

    1977-01-01

    Various electron and ion current, electric field, and magnetic field probes were developed and tested during the course of the investigation. A three dimensional probe drive system was constructed in order to investigate two and three dimensional phenomena occurring in the microwave plasma interaction. In most of the experiments reported here, a 1 GHz, 40 kilowatt, pulsed rf source (Applied Microwave), was used. The antenna was a 20 0 horn. A dipole fed parabolic antenna system capable of producing a focussed microwave beam at 2.3 GHz was developed and bench tested. This system will be used in future investigations at higher power levels

  16. Effect of component's geometry on the plasma nitriding behavior of AISI 4340 steel

    International Nuclear Information System (INIS)

    Asadi, Z. Soltani; Mahboubi, F.

    2012-01-01

    Highlights: → The thickness of the compound layer increases with increasing in temperature and groove width. → Surface layer at the remote regions from the edge is thinner than that of closer regions. → The hardness and the case depth of the nitrided layer increase with increasing the width of the groove. → Intensity of ε phase increases with increasing the width of the groove in both methods. → The ASPN specimens are covered by hexagonal particles and for the CPN by cauliflower shape nitrides. -- Abstract: The main aim of this work was to investigate the effect of the sample geometry on properties of the conventional plasma nitrided (CPN) and active screen plasma nitrided (ASPN) steel. Sample assemblies consisting of rectangular grooved steel blocks with different groove dimensions of 2, 4, 6, 8 and 10 (W) x 40 (H) x 20 (L) mm 3 and AISI 4340 steel plates (substrates) with dimensions of 10 x 40 x 60 mm 3 , to serve as groove cover, were prepared. The sample assemblies were conventional and active screen plasma nitrided under the gas mixture of 75%N 2 + 25%H 2 , at temperatures of 500 o C and 540 o C, pressure of 4 torr, for 5 h. Properties of the nitrided substrates were investigated by evaluating compound layer thickness, case depth, phase composition and hardness profile. Results of the experiments showed that the thickness of the compound layer, hardness and nitrided case depth increased with increasing the width of the groove for both methods. Also, in each sample, nitrogen atoms penetrated more deeply in the regions of the groove closer to the edge. Hallow cathode effect occurred at the sample with 2 mm width groove, in the CPN method, leading to the overheating of the sample. In ASPN, the hardness and the nitrided case depth are lower in comparison with CPN. The surface morphology of the CPN treated samples consists of cauliflower shape surface nitrides while the surface of the AS plasma nitrided samples are covered by the hexagonal particles with

  17. Plasma-nitriding assisted micro-texturing into stainless steel molds

    Directory of Open Access Journals (Sweden)

    Aizawa Tatsuhiko

    2015-01-01

    Full Text Available Micro-texturing has grown up to be one of the most promising procedures. This related application required for large-area, fine micro-texturing onto the stainless steel mold materials. A new method other than laser-machining, micro-milling or micro-EDM was awaited for further advancement of this micro-texturing. In the present paper, a plasma nitriding assisted micro-texturing was developed to make various kinds of micro-patterns onto the martensitic stainless steels. First, original patterns were printed onto the surface of substrate by using the ink-jet printer. Then, the masked substrate was subjected to high density plasma nitriding; the un-masked surfaces were nitrided to have higher hardness. This nitrided substrate was further treated by sand-blasting to selectively dig the soft, masked surfaces. Finally, the micro-patterned martensitic stainless steel substrate was fabricated as a mold to duplicate these micro-patterns onto the work materials. The spatial resolution and depth profile controllability of this plasma nitriding assisted micro-texturing was investigated for variety of initial micro-patterns. The original size and dimension of initial micro-patterns were precisely compared with the three dimensional geometry of micro-textures after blasting treatment. The plastic cover case for smart cellular phones was employed to demonstrate how useful this processing is in practice.

  18. Comparison of ferritic and austenitic plasma nitriding and nitrocarburizing behavior of AISI 4140 low alloy steel

    International Nuclear Information System (INIS)

    Fattah, M.; Mahboubi, F.

    2010-01-01

    This paper compares the ferritic and austenitic plasma nitriding and nitrocarburizing behavior of AISI 4140 low alloy steel carried out to improve the surface corrosion resistance. The gas composition for plasma nitriding was 85% N 2 -15% H 2 and that for plasma nitrocarburizing was 85% N 2 -12% H 2 -3% CO 2 . Both treatments were performed for 5 h, for different process temperatures of 570 and 620 o C for ferritic and austenitic plasma treatment, respectively. Optical microscopy, X-ray diffraction and potentiodynamic polarization technique in 3.5% NaCl solution, were used to study the treated surfaces. The results of X-ray analysis revealed that with increasing the treatment temperature from 570 to 620 o C for both treatments, the amount of ε phase decreased and γ' phase increased. Nitrocarburizing treatment resulted in formation of a more amount of ε phase with respect to nitriding treatment. However, the highest amount of ε phase was observed in the ferritic nitrocarburized sample at 570 o C. The sample nitrided at 620 o C exhibited the thickest layer. The potentiodynamic polarization results revealed that after plasma nitriding and nitrocarburizing at 570 o C, corrosion potential increased with respect to the untreated sample due to the noble nitride and carbonitride phases formed on the surface. After increasing the treatment temperature from 570 to 620 o C, corrosion potential decreased due to the less ε phase development in the compound layer and more porous compound layer formed at 620 o C with respect to the treated samples at 570 o C.

  19. Analysis of the tuning characteristics of microwave plasma source

    Energy Technology Data Exchange (ETDEWEB)

    Miotk, Robert, E-mail: rmiotk@imp.gda.pl; Jasiński, Mariusz [Centre for Plasma and Laser Engineering, The Szewalski Institute of Fluid-Flow Machinery, Polish Academy of Sciences, Fiszera 14, 80-231 Gdańsk (Poland); Mizeraczyk, Jerzy [Department of Marine Electronics, Gdynia Maritime University, Morska 81-87, 81-225 Gdynia (Poland)

    2016-04-15

    In this paper, we present an analysis of the tuning characteristics of waveguide-supplied metal-cylinder-based nozzleless microwave plasma source. This analysis has enabled to estimate the electron concentration n{sub e} and electron frequency collisions ν in the plasma generated in nitrogen and in a mixture of nitrogen and ethanol vapour. The parameters n{sub e} and ν are the basic quantities that characterize the plasma. The presented new plasma diagnostic method is particularly useful, when spectroscopic methods are useless. The presented plasma source is currently used in research of a hydrogen production from liquids.

  20. Analysis of the tuning characteristics of microwave plasma source

    International Nuclear Information System (INIS)

    Miotk, Robert; Jasiński, Mariusz; Mizeraczyk, Jerzy

    2016-01-01

    In this paper, we present an analysis of the tuning characteristics of waveguide-supplied metal-cylinder-based nozzleless microwave plasma source. This analysis has enabled to estimate the electron concentration n_e and electron frequency collisions ν in the plasma generated in nitrogen and in a mixture of nitrogen and ethanol vapour. The parameters n_e and ν are the basic quantities that characterize the plasma. The presented new plasma diagnostic method is particularly useful, when spectroscopic methods are useless. The presented plasma source is currently used in research of a hydrogen production from liquids.

  1. Solid state alloying by plasma nitriding and diffusion annealing treatment for austenitic stainless steel

    International Nuclear Information System (INIS)

    Pinedo, C.E.; Vatavuk, J.; Oliveira, S.D. de; Tschiptschin, A.P.

    1999-01-01

    Nitrogen has been added to stainless steels to improve mechanical strength and corrosion resistance. High nitrogen steel production is limited by high gas pressure requirements and low nitrogen solubility in the melt. One way to overcome this limitation is the addition of nitrogen in solid state because of its higher solubility in austenite. However, gas and salt bath nitriding have been done at temperatures around 550 C, where nitrogen solubility in the steel is still very low. High temperature nitriding has been, thus proposed to increase nitrogen contents in the steel but the presence of oxide layers on top of the steel is a barrier to nitrogen intake. In this paper a modified plasma nitriding process is proposed. The first step of this process is a hydrogen plasma sputtering for oxide removal, exposing active steel surface improving nitrogen pickup. This is followed by a nitriding step where high nitrogen contents are introduced in the outermost layer of the steel. Diffusion annealing is then performed in order to allow nitrogen diffusion into the core. AISI 316 austenitic stainless steel was plasma nitrided and diffusion annealed at 1423K, for 6 hours, with 0.2 MPa nitrogen pressure. The nitrided steel presented ∝60 μm outermost compact layer of (Fe,Cr) 3 N and (Fe,Cr) 4 N with 11 wt.% N measured by surface depth profiling chemical analysis - GDS system. During the annealing treatment the nitride layer was dissolved and nitrogen diffused to the core of the sample leaving more even nitrogen distribution into the steel. Using this technique one-millimetre thick sample were obtained having high nitrogen content and uniform distribution through the thickness. (orig.)

  2. Fatigue improvement in low temperature plasma nitrided Ti–6Al–4V alloy

    Energy Technology Data Exchange (ETDEWEB)

    Farokhzadeh, K.; Edrisy, A., E-mail: edrisy@uwindsor.ca

    2015-01-03

    In this study a low temperature (600 °C) treatment was utilized to improve the fatigue performance of plasma nitrided Ti–6Al–4V alloy by optimization of microstructure. In order to study the fatigue properties, rotation bending tests were conducted, the S–N curves were constructed, and the results were compared with those obtained by an elevated temperature treatment (900 °C) as well as conventional gas/plasma nitriding treatments reported in literature. The plasma nitrided alloy at 600 °C showed an endurance limit of 552 MPa which was higher than those achieved by conventional nitriding treatments performed at 750–1100 °C. In contrast, plasma nitriding at 900 °C resulted in the reduction of fatigue life by at least two orders of magnitude compared to the 600 °C treatment, accompanied by a 13% reduction of tensile strength and a 78% reduction of ductility. The deterioration of mechanical properties after the elevated temperature treatment was attributed to the formation of a thick compound layer (∼6 µm) on the surface followed by an α-Case (∼20 µm) and phase transformation in the bulk microstructure from fully equiaxed to bimodal with coarse grains (∼5 times higher average grain size value). The microstructure developed at 600 °C consisted of a thin compound layer (<2 µm) and a deep nitrogen diffusion zone (∼45 µm) while the bulk microstructure was maintained with only 40% grain growth. The micromechanisms of fatigue failures were identified by examination of the fracture surfaces under a scanning electron microscope (SEM). It was found that fatigue failure in the plasma nitrided alloy initiated from the surface in the low cycle region (N≤10{sup 5} cycles) and propagated in a ductile manner leading to the final rupture. No failures were observed in the high cycle region (N>10{sup 5} cycles) and the nitrided alloy endured cyclic loading until the tests were stopped at 10{sup 7} cycles. The thin morphology of the compound layer in this

  3. Fatigue improvement in low temperature plasma nitrided Ti–6Al–4V alloy

    International Nuclear Information System (INIS)

    Farokhzadeh, K.; Edrisy, A.

    2015-01-01

    In this study a low temperature (600 °C) treatment was utilized to improve the fatigue performance of plasma nitrided Ti–6Al–4V alloy by optimization of microstructure. In order to study the fatigue properties, rotation bending tests were conducted, the S–N curves were constructed, and the results were compared with those obtained by an elevated temperature treatment (900 °C) as well as conventional gas/plasma nitriding treatments reported in literature. The plasma nitrided alloy at 600 °C showed an endurance limit of 552 MPa which was higher than those achieved by conventional nitriding treatments performed at 750–1100 °C. In contrast, plasma nitriding at 900 °C resulted in the reduction of fatigue life by at least two orders of magnitude compared to the 600 °C treatment, accompanied by a 13% reduction of tensile strength and a 78% reduction of ductility. The deterioration of mechanical properties after the elevated temperature treatment was attributed to the formation of a thick compound layer (∼6 µm) on the surface followed by an α-Case (∼20 µm) and phase transformation in the bulk microstructure from fully equiaxed to bimodal with coarse grains (∼5 times higher average grain size value). The microstructure developed at 600 °C consisted of a thin compound layer (<2 µm) and a deep nitrogen diffusion zone (∼45 µm) while the bulk microstructure was maintained with only 40% grain growth. The micromechanisms of fatigue failures were identified by examination of the fracture surfaces under a scanning electron microscope (SEM). It was found that fatigue failure in the plasma nitrided alloy initiated from the surface in the low cycle region (N≤10 5 cycles) and propagated in a ductile manner leading to the final rupture. No failures were observed in the high cycle region (N>10 5 cycles) and the nitrided alloy endured cyclic loading until the tests were stopped at 10 7 cycles. The thin morphology of the compound layer in this study restricted

  4. Prototype Design of Plasma-Nitriding Apparatus for Components of Industries

    International Nuclear Information System (INIS)

    Bandriyana, B.; Tutun Nugraha; Silakhuddin

    2003-01-01

    An apparatus to carry-out plasma-nitriding surface treatment has been designed. The construction was planned as a prototype for a larger system at industrial scale. The design was based on a similar apparatus currently operating at the Accelerator Laboratory at the P3TM-BATAN, in Yogyakarta. The system consists of a main vacuum chamber from steel SS-304, 45 cm OD, 55 cm height and is equipped with a nitriding chamber in the inner part that also functions as a plasma container (Quartz, cylindrical, 38 cm OD, 40 cm height). The system utilized an anode-cathode pair to generate nitrogen plasma, as well as to accelerate and direct the positively-charged-plasma toward the surface of the material to be treated. The pressure inside the chamber is designed to be in the region of 10 -3 mb with a temperature between 350-590 o C. Pulsated DC high voltage can be set at 1-50 kV at a frequency between 100-1000 Hz and current 1- 50 mA. The safety and reliability features have been designed to obtain nitriding results that are in accordance with the required technical specification as well as economical constrain. It is hoped that this device can become a prototype for future development of an industrial scale plasma-nitriding apparatus. (author)

  5. Microstructure of Nitrided Aluminum Alloys Using an Electron-Beam-Excited-Plasma (EBEP)

    Institute of Scientific and Technical Information of China (English)

    L. Liu; A. Yamamoto; T. Hishida; H. Shoyama; T. Hara; T. Hara

    2004-01-01

    Nitriding of surface of aluminum alloys was carried out with using an electron-beam-excited-plasma (EBEP)technique. The EBEP is sustained by electron impact ionization with energetic electron beam. Two kinds of substrates,aluminum alloys AA5052 and AA5083, were exposed to the down flow of EBEP source at 843 K for 45min. The specimens were characterized with respect to following properties: crystallographic structure (XRD), morphology (SEM) and the cross sectional microstructures of the nitrided layer was observed using a scanning electron microscopy (SEM). There are some Al2O3 particles on the surface of the nitrided AA5052 and AA5083. The AIN layers were formed on the substrates with the thickness of 4.5 μ m for AA5052 and 0.5 μ m for AA5083. A relatively uniform nitrided surface layer composed of AIN can be observed on the AA5052 substrate. The grains size near the interfaces between the substrate and AIN layer were smaller than that near the surface. On the surface of AIN layer, the concentration of nitrogen was high and in the middle of AIN layer it had a constant concentration like the aluminum and the concentration was decreased with approaching to the interface. On the surface of nitrided AA5083, a uniform AIN layer was not formed as the reason for the high nitriding temperature.

  6. Processing of volatile organic compounds by microwave plasmas

    International Nuclear Information System (INIS)

    Mizeraczyk, J.; Jasinski, M.; Dors, M.; Zakrzewski, Z.

    2011-01-01

    In this paper atmospheric pressure microwave discharge methods and devices used for producing the nonthermal plasmas for processing of gases are presented. The main part of the paper concerns the microwave plasma sources (MPSs) for environmental protection applications. A few types of the MPSs, i.e. waveguidebased surface wave sustained MPS, coaxial-line-based and waveguide-based nozzle-type MPSs, waveguidebased nozzleless cylinder-type MPS and MPS for microdischarges are presented. Also, results of the laboratory experiments on the plasma processing of several highly-concentrated (up to several tens percent) volatile organic compounds (VOCs), including Freon-type refrigerants, in the moderate (200-400 W) waveguide-based nozzletype MPS (2.45 GHz) are presented. The results showed that the microwave discharge plasma fully decomposed the VOCs at relatively low energy cost. The energy efficiency of VOCs decomposition reached 1000 g/kWh. This suggests that the microwave discharge plasma can be a useful tool for environmental protection applications. In this paper also results of the use of the waveguide-based nozzleless cylinder-type MPS to methane reforming into hydrogen are presented. (author)

  7. Processing of volatile organic compounds by microwave plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Mizeraczyk, J. [Centre for Plasma and Laser Engineering, Szewalski Institute of Fluid-Flow Machinery, Polish Academy of Sciences, Gdansk (Poland); Department of Marine Electronics, Gdynia Martime University, Gdynia (Poland); Jasinski, M.; Dors, M.; Zakrzewski, Z. [Centre for Plasma and Laser Engineering, Szewalski Institute of Fluid-Flow Machinery, Polish Academy of Sciences, Gdansk (Poland)

    2011-07-01

    In this paper atmospheric pressure microwave discharge methods and devices used for producing the nonthermal plasmas for processing of gases are presented. The main part of the paper concerns the microwave plasma sources (MPSs) for environmental protection applications. A few types of the MPSs, i.e. waveguidebased surface wave sustained MPS, coaxial-line-based and waveguide-based nozzle-type MPSs, waveguidebased nozzleless cylinder-type MPS and MPS for microdischarges are presented. Also, results of the laboratory experiments on the plasma processing of several highly-concentrated (up to several tens percent) volatile organic compounds (VOCs), including Freon-type refrigerants, in the moderate (200-400 W) waveguide-based nozzletype MPS (2.45 GHz) are presented. The results showed that the microwave discharge plasma fully decomposed the VOCs at relatively low energy cost. The energy efficiency of VOCs decomposition reached 1000 g/kWh. This suggests that the microwave discharge plasma can be a useful tool for environmental protection applications. In this paper also results of the use of the waveguide-based nozzleless cylinder-type MPS to methane reforming into hydrogen are presented. (author)

  8. Study of microwave emission from a dense plasma focus

    International Nuclear Information System (INIS)

    Gerdin, G.; Venneri, F.; Tanisi, M.

    1985-01-01

    Microwave emission was detected in a 12.5 kJ dense plasma focus, using microwave horns and detectors placed in various locations outside the device. The results show that the parallel plates connecting the focus to its capacitor banks act as antennas and transmission lines, rather than wave guides. Subsequent measurements were performed with a microwave detector (R-band) attached to the focus anode, directly looking into the coaxial gun region, allowing to restrict the microwave emitting region to the muzzle end of the focus. The microwave frequency spectrum, determined with a time of flight detection system, strongly suggests the lower hybrid instability as the driving mechanism of the emissions. Comparing the time sequence of the emissions with those of other observable phenomena in the focus, a model was developed, to explain the possible relationship between the generation of microwave radiation and turbulence induced resistivity in the focus pinch. According to the model, microwaves and enhanced resistivity are caused by current driven instabilities occurring in the current sheath produced at the outer boundary of the pinch during the initial compression phase. Comparisons of the model predictions with observed experimental results are presented, including time resolved measurements of the pinch resistivity

  9. Microstructural characterization of an AISI-SAE 4140 steel without nitridation and nitrided; Caracterizacion microestructural de un acero AISI-SAE 4140 sin nitrurar y nitrurado

    Energy Technology Data Exchange (ETDEWEB)

    Medina F, A.; Naquid G, C. [Gerencia de Ciencia de Materiales, Depto. de Sintesis y Caracterizacion de Materiales, A.P. 18-1027, 11801 Mexico D.F. (Mexico)

    2000-07-01

    It was micro structurally characterized an AISI-SAE 4140 steel before and after of nitridation through the nitridation process by plasma post-unloading microwaves through Optical microscopy (OM), Scanning electron microscopy (SEM) by means of secondary electrons and retrodispersed, X-ray diffraction (XRD), Energy dispersion spectra (EDS) and mapping of elements. (Author)

  10. The influence of plasma nitriding on the fatigue behavior of austenitic stainless steel types AISI 316 and AISI 304

    International Nuclear Information System (INIS)

    Varavallo, Rogerio; Manfrinato, Marcos Dorigao; Rossino, Luciana Sgarbi; Spinelli, Dirceu; Riofano, Rosamel Melita Munoz

    2010-01-01

    The plasma nitriding process has been used as an efficient method to optimize the surface properties of steel and alloy in order to increase their wear, fatigue and corrosion resistance. This paper reports on a study of the composition and influence of the nitrided layer on the high-cycle fatigue properties of the AISI 316 and 304 type austenitic stainless steels. Test specimens of AISI 316 and 304 steel were nitrided at 400 deg C for 6 hours under a pressure of 4.5 mbar, using a gas mixture of 80% volume of H 2 and 20% volume of N 2 . The rotary fatigue limit of both nitrided and non-nitrided steels was determined, and the effect of the treatment on the fatigue limit of the two steels was evaluated. The mechanical properties of the materials were evaluated based on tensile tests, and the nitrided layer was characterized by microhardness tests, scanning electron microscopy and X-ray diffraction. The resulting nitride layer showed high hardness and mechanical strength, increasing the fatigue limit of the nitrided material in comparison with the non-nitrided one. The fatigue limit of the 316 steel increased from 400 MPa to 510 MPa in response to nitriding, while that of the 304 steel increased from 380 MPa to 560 MPa. One of the contributing factors of this increase was the introduction of residual compressive stresses during the surface hardening process, which reduce the onset of crack formation underneath the nitride layer. (author)

  11. Microwave-plasma interactions studied via mode diagnostics in ALPHA

    Energy Technology Data Exchange (ETDEWEB)

    Friesen, T., E-mail: tim.friesen@cern.ch [University of Calgary, Department of Physics and Astronomy (Canada); Andresen, G. B. [Aarhus University, Department of Physics and Astronomy (Denmark); Ashkezari, M. D. [Simon Fraser University, Department of Physics (Canada); Baquero-Ruiz, M. [University of California, Department of Physics (United States); Bertsche, W. [Swansea University, Department of Physics (United Kingdom); Bowe, P. D. [Aarhus University, Department of Physics and Astronomy (Denmark); Butler, E. [CERN, Physics Department (Switzerland); Cesar, C. L. [Universidade Federal do Rio de Janeiro, Instituto de Fisica (Brazil); Chapman, S. [University of California, Department of Physics (United States); Charlton, M.; Eriksson, S. [Swansea University, Department of Physics (United Kingdom); Fajans, J. [University of California, Department of Physics (United States); Fujiwara, M. C. [University of Calgary, Department of Physics and Astronomy (Canada); Gill, D. R. [TRIUMF (Canada); Gutierrez, A. [University of British Columbia, Department of Physics and Astronomy (Canada); Hangst, J. S. [Aarhus University, Department of Physics and Astronomy (Denmark); Hardy, W. N. [University of British Columbia, Department of Physics and Astronomy (Canada); Hayano, R. S. [University of Tokyo, Department of Physics (Japan); Hayden, M. E. [Simon Fraser University, Department of Physics (Canada); Humphries, A. J. [Swansea University, Department of Physics (United Kingdom); Collaboration: ALPHA Collaboration; and others

    2012-12-15

    The goal of the ALPHA experiment is the production, trapping and spectroscopy of antihydrogen. A direct comparison of the ground state hyperfine spectra in hydrogen and antihydrogen has the potential to be a high-precision test of CPT symmetry. We present a novel method for measuring the strength of a microwave field for hyperfine spectroscopy in a Penning trap. This method incorporates a non-destructive plasma diagnostic system based on electrostatic modes within an electron plasma. We also show how this technique can be used to measure the cyclotron resonance of the electron plasma, which can potentially serve as a non-destructive measurement of plasma temperature.

  12. TRANSMISSION AND ABSORPTION OF MICROWAVES BY AN INHOMOGENEOUS SPHERE PLASMA

    Institute of Scientific and Technical Information of China (English)

    SONG Falun; CAO Jinxiang; WANG Ge

    2004-01-01

    The numerical calculation of the transmission and absorption of microwaves at an arbitrarily incident angle to the inhomogeneous spherically symmetric plasma is presented.The nonuniform sphere is modeled by a series of concentric spherical shells, and the electron density is constant in each shell. The overall density profile follows any given distribution function. By using the geometrical optics approximation and considering the propagation coefficient is complex, as well as the attenuation and phase coefficients are vectors, the detailed evaluation shows that the transmission and absorption of microwaves in the inhomogeneous spherically symmetric plasma depend on the electron and neutral particle collision frequency, central density, incident angle of the microwaves and density distribution profiles.

  13. The Use of Plasma Technique in Nitridation Process of Metal Alloy DIN 42CrMo4

    International Nuclear Information System (INIS)

    Purwanto; Malau, Viktor; Tjipto Sujitno

    2003-01-01

    Nitridation process with plasma technique is one of technique for surface treatment of a material. Research on plasma technique for nitridation process has been carried out to find out the nitridation effect on properties of metal alloy DIN 42CrM04. Nitridation process with plasma technique was conducted in a vacuum tube under following conditions 0.36 torr of pressure, 300 o C of temperature and nitridation times 1, 2, and 3 hours. Nitridation process was followed by hardness test measurement using High Quality Micro Hardness Tester machine, serial number MM-0054, as well as microstructure test using Scanning Electron Microscope (SEM) coupled with Energy Dispersive Spectroscopy (EDS) EDAX-DX4. The results showed that surface hardness increased after nitridation process. For nitridation processes for 1, 2, and 3 hours, the hardness increased from 291 kg/mm 2 to 303 kg/mm 2 , 324 kg/mm 2 and 403 kg/mm 2 , respectively. The results from micro structure observation showed that new phase of Ferro Nitride (Fe 4 N) has been formed with 4.17% nitrogen weight equivalent to 14.73% nitrogen atom and with the thickness of 5.71 μm, 5.08% nitrogen weight or 17.51% nitrogen atom and 6.78 μm thickness, and 5.69% nitrogen weight or 19.24% nitrogen atom and 8.57 μm thickness. (author)

  14. Microwave plasma CVD of NANO structured tin/carbon composites

    Science.gov (United States)

    Marcinek, Marek [Warszawa, PL; Kostecki, Robert [Lafayette, CA

    2012-07-17

    A method for forming a graphitic tin-carbon composite at low temperatures is described. The method involves using microwave radiation to produce a neutral gas plasma in a reactor cell. At least one organo tin precursor material in the reactor cell forms a tin-carbon film on a supporting substrate disposed in the cell under influence of the plasma. The three dimensional carbon matrix material with embedded tin nanoparticles can be used as an electrode in lithium-ion batteries.

  15. A multifunctional microwave plasma reaction apparatus and its applications

    International Nuclear Information System (INIS)

    Wang Xizhang; Wu Qiang; Hu Zheng; Xu Hua; Miao Shui; Chen Yi

    2000-01-01

    A multifunctional apparatus for microwave plasma reaction has been set up, which can be used in the fields such as chemical synthesis, surface modification, and heterogeneous catalysis. The apparatus has laid an experimental foundation for new methods, new technologies, and new train of thoughts to be explored

  16. Microwave plasma deposition of diamond like carbon coatings

    Indian Academy of Sciences (India)

    Abstract. The promising applications of the microwave plasmas have been appearing in the fields of chemical processes and semiconductor manufacturing. Applications include surface deposition of all types including diamond/diamond like carbon (DLC) coatings, etching of semiconductors, promotion of organic reactions, ...

  17. Microstructure and corrosion behaviour of pulsed plasma-nitrided AISI H13 tool steel

    International Nuclear Information System (INIS)

    Basso, Rodrigo L.O.; Pastore, Heloise O.; Schmidt, Vanessa; Baumvol, Israel J.R.; Abarca, Silvia A.C.; Souza, Fernando S. de; Spinelli, Almir; Figueroa, Carlos A.; Giacomelli, Cristiano

    2010-01-01

    The effect of pulsed plasma nitriding temperature and time on the pitting corrosion behaviour of AISI H13 tool steel in 0.9% NaCl solutions was investigated by cyclic polarization. The pitting potential (E pit ) was found to be dependent on the composition, microstructure and morphology of the surface layers, whose properties were determined by X-ray diffraction and scanning electron microscopy techniques. The best corrosion protection was observed for samples nitrided at 480 o C and 520 o C. Under such experimental conditions the E pit -values shifted up to 1.25 V in the positive direction.

  18. The numerical simulation of plasma flow in cylindrical resonant cavity of microwave plasma thruster

    International Nuclear Information System (INIS)

    Tang, J.-L.; He, H.-Q; Mao, G.-W.

    2004-01-01

    Microwave Plasma Thruster (MPT) is an electro-thermal propulsive device. MPT consists of microwave generator, gas storing and supplying system, resonant cavity and accelerative nozzle. It generates free-floating plasma brought by the microwave discharge breakdown gas in the resonant cavity, and the plasma exhausted from nozzle produces thrust. MPT has prospective application in spacecraft because of its advantages of high thrust, moderate specific impulse and high efficiency. In this paper, the numerical simulation of the coupling flow field of microwave plasma in resonant cavity under different frequencies will be discussed. The results of numerical simulation are as follows: 1) When the resonant model TM 011 was used, the higher the microwave frequency was, the smaller the size of MPT. The distribution of the electromagnetic field in small cavity, however, remain unchanged. 2) When the resonant model was used, the distribution of the temperature, the pressure and the electronic density in the resonant cavity remained unchanged under different resonant frequencies. 3) When the resonant frequency was increased with a fixed pressure distribution in a small cavity, compare to the MPT with lower frequency, the gas flow rate, the microwave power and the nozzle throat diameter of MPT all decreased. 4) The electromagnetic field in the cylindrical resonant cavity for all MPT with different frequencies was disturbed by the plasma formation. The strong disturbance happened in the region close to the plasma. (author)

  19. The Influence of Hot-Rolled Temperature on Plasma Nitriding Behavior of Iron-Based Alloys

    Science.gov (United States)

    El-Hossary, F. M.; Khalil, S. M.; Lotfy, Kh.; Kassem, M. A.

    2009-07-01

    Experiments were performed with an aim of studying the effect of hot-rolled temperature (600 and 900°C) on radio frequency (rf) plasma nitriding of Fe93Ni4Zr3 alloy. Nitriding was carried out for 10 min in a nitrogen atmosphere at a base pressure of 10-2 mbarr. Different continuous plasma processing powers of 300-550 W in steps 50 W or less were applied. Nitrided hot-rolled specimens were characterized by optical microscopy (OM), X-ray diffraction (XRD) and microhardness measurements. The results reveal that the surface of hot-rolled rf plasma nitrided specimens at 600°C is characterized with a fine microstructure as a result of the high nitrogen solubility and diffusivity. Moreover, the hot-rolled treated samples at 600°C exhibit higher microhardness value than the associated values of hot-rolled treated samples at 900°C. The enhancement of microhardness is due to precipitation and predominance of new phases ( γ and ɛ phases). Mainly, this conclusion has been attributed to the high defect densities and small grain sizes of the samples hot-rolled at 600°C. Generally, the refinement of grain size plays a dramatic role in improvement of mechanical properties of tested samples.

  20. Microwave plasma source having improved switching operation from plasma ignition phase to normal ion extraction phase

    International Nuclear Information System (INIS)

    Sakudo, N.; Abe, K.; Koike, H.; Okada, O.; Tokiguchi, K.

    1985-01-01

    In a microwave plasma source, a discharge space supplied with a microwave electric field is supplied with a DC magnetic field. A material to be ionized is introduced into the discharge space to produce plasma, whereby ions are extracted through an ion extracting system. A switch is provided for effecting through switching operation the change-over of the magnetic field applied to the discharge space from the intensity for the ignition of plasma to the intensity for ion extraction in succession to completion of the plasma ignition

  1. MTX [Microwave Tokamak Experiment] plasma diagnostic system

    International Nuclear Information System (INIS)

    Rice, B.W.; Hooper, E.B.; Brooksby, C.A.

    1987-01-01

    In this paper, a general overview of the MTX plasma diagnostics system is given. This includes a description of the MTX machine configuration and the overall facility layout. The data acquisition system and techniques for diagnostic signal transmission are also discussed. In addition, the diagnostic instruments planned for both an initial ohmic-heating set and a second FEL-heating set are described. The expected range of plasma parameters along with the planned plasma measurements will be reviewed. 7 refs., 5 figs

  2. Large-scale production of graphitic carbon nitride with outstanding nitrogen photofixation ability via a convenient microwave treatment

    Energy Technology Data Exchange (ETDEWEB)

    Ma, Huiqiang [College of Chemistry, Chemical Engineering, and Environmental Engineering, Liaoning Shihua University, Fushun 113001 (China); College of Environment and Resources, Key Lab of Groundwater Resources and Environment, Ministry of Education, Jilin University, Changchun 130021 (China); Shi, Zhenyu; Li, Shuang [College of Chemistry, Chemical Engineering, and Environmental Engineering, Liaoning Shihua University, Fushun 113001 (China); Liu, Na, E-mail: Naliujlu@163.com [College of Environment and Resources, Key Lab of Groundwater Resources and Environment, Ministry of Education, Jilin University, Changchun 130021 (China)

    2016-08-30

    Highlights: • Microwave method for synthesizing g-C{sub 3}N{sub 4} with N{sub 2} photofixation ability is reported. • Nitrogen vacancies play the important role on the nitrogen photofixation ability. • The present process is a convenient method for large-scale production of g-C{sub 3}N{sub 4}. - Abstract: A convenient microwave treatment for synthesizing graphitic carbon nitride (g-C{sub 3}N{sub 4}) with outstanding nitrogen photofixation ability under visible light is reported. X-ray diffraction (XRD), N{sub 2} adsorption, UV–vis spectroscopy, SEM, N{sub 2}-TPD, EPR, photoluminescence (PL) and photocurrent measurements were used to characterize the prepared catalysts. The results indicate that microwave treatment can form many irregular pores in as-prepared g-C{sub 3}N{sub 4}, which causes the increased surface area and separation rate of electrons and holes. More importantly, microwave treatment causes the formation of many nitrogen vacancies in as-prepared g-C{sub 3}N{sub 4}. These nitrogen vacancies not only serve as active sites to adsorb and activate N{sub 2} molecules but also promote interfacial charge transfer from catalysts to N{sub 2} molecules, thus significantly improving the nitrogen photofixation ability. Moreover, the present process is a convenient method for large-scale production of g-C{sub 3}N{sub 4} which is significantly important for the practical application.

  3. Large-scale production of graphitic carbon nitride with outstanding nitrogen photofixation ability via a convenient microwave treatment

    International Nuclear Information System (INIS)

    Ma, Huiqiang; Shi, Zhenyu; Li, Shuang; Liu, Na

    2016-01-01

    Highlights: • Microwave method for synthesizing g-C_3N_4 with N_2 photofixation ability is reported. • Nitrogen vacancies play the important role on the nitrogen photofixation ability. • The present process is a convenient method for large-scale production of g-C_3N_4. - Abstract: A convenient microwave treatment for synthesizing graphitic carbon nitride (g-C_3N_4) with outstanding nitrogen photofixation ability under visible light is reported. X-ray diffraction (XRD), N_2 adsorption, UV–vis spectroscopy, SEM, N_2-TPD, EPR, photoluminescence (PL) and photocurrent measurements were used to characterize the prepared catalysts. The results indicate that microwave treatment can form many irregular pores in as-prepared g-C_3N_4, which causes the increased surface area and separation rate of electrons and holes. More importantly, microwave treatment causes the formation of many nitrogen vacancies in as-prepared g-C_3N_4. These nitrogen vacancies not only serve as active sites to adsorb and activate N_2 molecules but also promote interfacial charge transfer from catalysts to N_2 molecules, thus significantly improving the nitrogen photofixation ability. Moreover, the present process is a convenient method for large-scale production of g-C_3N_4 which is significantly important for the practical application.

  4. Formation of Ti-N graded bioceramic layer by DC hollow-cathode plasma nitriding

    Institute of Scientific and Technical Information of China (English)

    ZHENG Chuan-lin

    2004-01-01

    Ti-N graded ceramic layer was formed on titanium by using DC hollow-cathode plasma nitriding technique. The structure of Ti-N layer was analyzed using X-ray diffractometry(XRD) with Cu Kα radiation, and the microhardness( HV0.1) was measured from the surface to inner along the cross section of Ti-N layer. The results indicate that the Ti-N graded layer is composed of ε-Ti2 N, δ-TiN and α-Ti(N) phases. Mechanism discussion shows that hollow-cathode discharge can intensify gas ionization, increase current density and enhance the nitriding potential, which directly increases the thickness of the diffusion coatings compared with traditional nitriding methods.

  5. Controlling of Nitriding Process on Reactive Plasma Spraying of Al Particles

    Energy Technology Data Exchange (ETDEWEB)

    Shahien, Mohammed [Graduate Student, Toyohashi University of Technology (Japan); Yamada, Motohiro; Yasui, Toshiaki; Fukumoto, Masahiro, E-mail: mo.shahien@yahoo.com [Toyohashi University of Technology (Japan)

    2011-10-29

    Reactive plasma spraying (RPS) has been considered as a promising technology for in-situ formation of aluminum nitride (AlN) thermally sprayed coatings. To fabricate thick A lN coatings in RPS process, controlling and improving the in-flight nitriding reaction of Al particles is required. In this study, it was possible to control the nitriding reaction by using ammonium chloride (NH{sub 4}Cl) powders. Thick and dense AlN coating (more than 300 {mu}m thickness) was successfully fabricated with small addition of NH{sub 4}Cl powders. Thus, addition of NH{sub 4}Cl prevented the Al aggregation by changing the reaction pathway to a mild way with no explosive mode (relatively low heating rates) and it acts as a catalyst, nitrogen source and diluent agent.

  6. Controlling of Nitriding Process on Reactive Plasma Spraying of Al Particles

    International Nuclear Information System (INIS)

    Shahien, Mohammed; Yamada, Motohiro; Yasui, Toshiaki; Fukumoto, Masahiro

    2011-01-01

    Reactive plasma spraying (RPS) has been considered as a promising technology for in-situ formation of aluminum nitride (AlN) thermally sprayed coatings. To fabricate thick A lN coatings in RPS process, controlling and improving the in-flight nitriding reaction of Al particles is required. In this study, it was possible to control the nitriding reaction by using ammonium chloride (NH 4 Cl) powders. Thick and dense AlN coating (more than 300 μm thickness) was successfully fabricated with small addition of NH 4 Cl powders. Thus, addition of NH 4 Cl prevented the Al aggregation by changing the reaction pathway to a mild way with no explosive mode (relatively low heating rates) and it acts as a catalyst, nitrogen source and diluent agent.

  7. Plasma-enhanced growth, composition, and refractive index of silicon oxy-nitride films

    DEFF Research Database (Denmark)

    Mattsson, Kent Erik

    1995-01-01

    Secondary ion mass spectrometry and refractive index measurements have been carried out on silicon oxy-nitride produced by plasma-enhanced chemical vapor deposition (PECVD). Nitrous oxide and ammonia were added to a constant flow of 2% silane in nitrogen, to produce oxy-nitride films with atomic...... nitrogen concentrations between 2 and 10 at. %. A simple atomic valence model is found to describe both the measured atomic concentrations and published material compositions for silicon oxy-nitride produced by PECVD. A relation between the Si–N bond concentration and the refractive index is found......-product. A model, that combine the chemical net reaction and the stoichiometric rules, is found to agree with measured deposition rates for given material compositions. Effects of annealing in a nitrogen atmosphere has been investigated for the 400 °C– 1100 °C temperature range. It is observed that PECVD oxy...

  8. Crystalline and amorphous carbon nitride films produced by high-energy shock plasma deposition

    International Nuclear Information System (INIS)

    Bursilll, L.A.; Peng, Julin; Gurarie, V.N.; Orlov, A.V.; Prawer, S.

    1995-01-01

    High-energy shock plasma deposition techniques are used to produce carbon-nitride films containing both crystalline and amorphous components. The structures are examined by high-resolution transmission electron microscopy, parallel-electron-energy loss spectroscopy and electron diffraction. The crystalline phase appears to be face-centered cubic with unit cell parameter approx. a=0.63nm and it may be stabilized by calcium and oxygen at about 1-2 at % levels. The carbon atoms appear to have both trigonal and tetrahedral bonding for the crystalline phase. There is PEELS evidence that a significant fraction of the nitrogen atoms have sp 2 trigonal bonds in the crystalline phase. The amorphous carbon-nitride film component varies from essentially graphite, containing virtually no nitrogen, to amorphous carbon-nitride containing up to 10 at % N, where the fraction of sp 3 bonds is significant. 15 refs., 5 figs

  9. DECOMPOSITION OF TARS IN MICROWAVE PLASMA – PRELIMINARY RESULTS

    Directory of Open Access Journals (Sweden)

    Mateusz Wnukowski

    2014-07-01

    Full Text Available The paper refers to the main problem connected with biomass gasification - a presence of tar in a product gas. This paper presents preliminary results of tar decomposition in a microwave plasma reactor. It gives a basic insight into the construction and work of the plasma reactor. During the experiment, researches were carried out on toluene as a tar surrogate. As a carrier gas for toluene and as a plasma agent, nitrogen was used. Flow rates of the gases and the microwave generator’s power were constant during the whole experiment. Results of the experiment showed that the decomposition process of toluene was effective because the decomposition efficiency attained above 95%. The main products of tar decomposition were light hydrocarbons and soot. The article also gives plans for further research in a matter of tar removal from the product gas.

  10. Effect of plasma nitriding on electrodeposited Ni–Al composite coating

    DEFF Research Database (Denmark)

    Daemi, N.; Mahboubi, F.; Alimadadi, Hossein

    2011-01-01

    In this study plasma nitriding is applied on nickel–aluminum composite coating, deposited on steel substrate. Ni–Al composite layers were fabricated by electro-deposition process in Watt’s bath containing Al particles. Electrodeposited specimens were subjected to plasma atmosphere comprising of N2......–20% H2, at 500°C, for 5h. The surface morphology investigated, using a scanning electron microscope (SEM) and the surface roughness was measured by use of contact method. Chemical composition was analyzed by X-ray fluorescence spectroscopy and formation of AlN phase was confirmed by X-ray diffraction....... The corrosion resistance of composite coatings was measured by potentiodynamic polarization in 3.5% NaCl solution. The obtained results show that plasma nitriding process leads to an increase in microhardness and corrosion resistance, simultaneously....

  11. Plasma CVD reactor with two-microwave oscillators for diamond film synthesis

    International Nuclear Information System (INIS)

    Nagatsu, M.; Miyake, M.; Maeda, J.

    2006-01-01

    In this study, we present the experimental results of a new type of microwave plasma CVD system, where two of 1.5 kW microwave sources were used for enlarging the plasma discharge and the diamond film growth. One of the microwave oscillators was used to produce the microwave plasma as in the conventional microwave plasma CVD device, while the second one was used to enlarge the plasma by introducing microwave from the launcher mounted at the substrate stage. We demonstrated the enlargement of plasma discharge area from 60 mm to 100 mm in diameter by using the two-microwave oscillators system. Characteristics of diamond films deposited using H 2 /CH 4 plasmas were also investigated using a scanning electron microscope (SEM) and Raman spectroscopy

  12. Ar + NO microwave plasmas for Escherichia coli sterilization

    Energy Technology Data Exchange (ETDEWEB)

    Hueso, Jose L; Rico, Victor J; Cotrino, Jose; Gonzalez-Elipe, Agustin R [Instituto de Ciencia de Materiales de Sevilla, Centro Mixto CSIC-Universidad de Sevilla, Centro de Investigaciones Cientificas Isla de la Cartuja, Avda. Americo Vespucio 49, 41092 Sevilla (Spain); Frias, Jose E [Instituto de BioquImica Vegetal y FotosIntesis (IBVF-CSIC). Centro de Investigaciones CientIficas Isla de la Cartuja. Avda Americo Vespucio, 49, 41092 Sevilla (Spain)], E-mail: jhueso@icmse.csic.es

    2008-05-07

    Ar + NO microwave discharges are used for sterilization and the results are compared with additional experiments with Ar, O{sub 2} and N{sub 2}-O{sub 2} plasma mixtures. The NO{sup *} species produced in the Ar-NO mixtures remain up to long distances from the source, thus improving the sterilization efficiency of the process. E. coli individuals exposed to the Ar + NO plasma undergo morphological damage and cell lysis. Combined effects of etching (by O{sup *} and Ar{sup *} species) and UV radiation (from deactivation of NO{sup *} species) are responsible for the higher activity found for this plasma mixture. (fast track communication)

  13. Ar + NO microwave plasmas for Escherichia coli sterilization

    International Nuclear Information System (INIS)

    Hueso, Jose L; Rico, Victor J; Cotrino, Jose; Gonzalez-Elipe, Agustin R; Frias, Jose E

    2008-01-01

    Ar + NO microwave discharges are used for sterilization and the results are compared with additional experiments with Ar, O 2 and N 2 -O 2 plasma mixtures. The NO * species produced in the Ar-NO mixtures remain up to long distances from the source, thus improving the sterilization efficiency of the process. E. coli individuals exposed to the Ar + NO plasma undergo morphological damage and cell lysis. Combined effects of etching (by O * and Ar * species) and UV radiation (from deactivation of NO * species) are responsible for the higher activity found for this plasma mixture. (fast track communication)

  14. Microwave and optical diagnostics in a gadolinium plasma

    International Nuclear Information System (INIS)

    Larousse, B.

    1997-01-01

    The optimization of the separation process of the gadolinium isotopes by Ion Cyclotron Resonance requires a precise knowledge of the physical characteristics of the plasma. Thus, two kinds of diagnostics have been developed: the first one to estimate the microwave power inside the source and the second one to measure the density of atomic and ionic of the gadolinium inside the plasma source and in front of the collector. Microwave diagnostic: A microstrip antenna has been designed and developed in order to characterize the microwave at 36 GHz frequency in the plasma source. The experimental results for different plasma regimes are presented. The measurements inside the plasma source show a maximum of microwave absorption for an argon pressure of 10 -4 mb (93% of absorption of the incident wave in the conditions of isotope separation). Laser absorption diagnostic: The theory of laser absorption in presence of a magnetic field is recalled and the first results are presented. In the spectral range between 560 and 620 nm, corresponding to high energy levels of gadolinium, no signal is obtained so that the density is below the detection limit 10 10 cm -3 . In the spectral range between 380 and 400 nm, two lines are observed, issue from the fundamental and metastable (633 cm -1 ) levels. The density of metastable level of gadolinium ions is about 10 10 cm -3 with a relative precision of 15 % and its variation is studied as a function of argon pressure, at different sections of the plasma column (source, collector). The achieved set of measurements has been performed in order to check the theoretical models. (author)

  15. Comparative tribological studies of duplex surface treated AISI 1045 steels fabricated by combinations of plasma nitriding and aluminizing

    International Nuclear Information System (INIS)

    Haftlang, Farahnaz; Habibolahzadeh, Ali; Sohi, Mahmoud Heydarzadeh

    2014-01-01

    Highlights: • AlN coating was applied on AISI 1045 steel via plasma nitriding and aluminizing. • Aluminizing of pre-nitrided specimen provides the highest surface hardness. • The lowest wear rate was obtained via aluminizing of pre-nitrided specimen. • Wear mechanism of the modified layer consists of oxidative and spallung wear. - Abstract: Duplex surface treatments via aluminizing and plasma nitriding were carried out on AISI 1045 steel. A number of work pieces were aluminized and subsequently plasma nitrided (Al–PN) and other work pieces were plasma nitrided and then aluminized (PN–Al). Aluminizing was carried out via pack process at 1123 K for 5 h and plasma nitriding was performed at 823 K for 5 h. The fabricated steels were characterized using scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD) and microhardness testing. Tribological behaviors of the duplex treated AISI 1045 steels were examined against tungsten carbide pin using a pin-on-disc apparatus at room temperature. The PN–Al specimen showed higher surface hardness, lower wear rate and coefficient of friction than the Al–PN one. It was noticed from the worn surfaces that tribo-oxidation plays an important role in wear behavior of both specimens

  16. Plasma assisted nitriding for micro-texturing onto martensitic stainless steels*

    Directory of Open Access Journals (Sweden)

    Katoh Takahisa

    2015-01-01

    Full Text Available Micro-texturing method has grown up to be one of the most promising procedures to form micro-lines, micro-dots and micro-grooves onto the mold-die materials and to duplicate these micro-patterns onto metallic or polymer sheets via stamping or injection molding. This related application requires for large-area, fine micro-texturing onto the martensitic stainless steel mold-die materials. A new method other than laser-machining, micro-milling or micro-EDM is awaited for further advancement of this micro-texturing. In the present paper, a new micro-texturing method is developed on the basis of the plasma assisted nitriding to transform the two-dimensionally designed micro-patterns to the three dimensional micro-textures in the martensitic stainless steels. First, original patterns are printed onto the surface of stainless steel molds by using the dispenser or the ink-jet printer. Then, the masked mold is subjected to high density plasma nitriding; the un-masked surfaces are nitrided to have higher hardness, 1400 Hv than the matrix hardness, 200 Hv of stainless steels. This nitrided mold is further treated by sand-blasting to selectively remove the soft, masked surfaces. Finally, the micro-patterned martensitic stainless steel mold is fabricated as a tool to duplicate these micro-patterns onto the plastic materials by the injection molding.

  17. Some Temperature Effects on AISI-304 Nitriding in an Inductively Coupled RF Plasma

    International Nuclear Information System (INIS)

    Valencia-Alvarado, R.; Barocio, S. R.; Mercado-Cabrera, A.; Pena-Eguiluz, R.; Munoz-Castro, A. E.; Piedad-Beneitez, A. de la; Rosa-Vazquez, J. de la; Lopez-Callejas, R.; Godoy-Cabrera, O. G.

    2006-01-01

    Some recent results obtained from nitriding AISI 304 stainless steel samples, 1.2 cm in diameter and 0.5 cm thick are reported here in the case of an 85% hydrogen and 15% nitrogen mixture work gas. The process was carried out from 300 to 400 W for (13.56 MHz) inductively coupled plasma within a 60 cm long pyrex glass tube 3.5 cm in diameter where the samples were biased up to -300 V with respect to earth. The resulting hardness appears to be a function of the substrate temperature which varied from 200 deg. C at a 0 V bias to 550 deg. C at -300 V. The plasma density at 400 W reached 3x1010 cm-3 with a 4 eV electron temperature. Prior to nitriding, all the samples were polished with 0.05 μm diamond paste, leading to a 30 nm average roughness (Ra). After nitriding at -300 V, the Ra rose until ∼400 nm while hardness values of 1500 HV under 300 g loads were measured. X ray diffraction indicates that the extended phase amplitude (γN), Fe and Cr nitride depends on the substrate temperature

  18. Single-shot Thomson scattering on argon plasmas created by the Microwave Plasma Torch; evidence for a new plasma class

    NARCIS (Netherlands)

    Mullen, van der J.J.A.M.; Sande, van de M.J.; Vries, de N.; Broks, B.H.P.; Iordanova, E.I.; Gamero, A.; Torres, J.; Sola, A.

    2007-01-01

    To determine the fine-structure size of plasmas created by a Microwave Plasma Torch (MPT), single-shot Thomson scattering (TS) measurements were performed. The aim was to find a solution for the long-standing discrepancy between experiments and Global Plasma Models (GPMs). Since these GPMs are based

  19. TEM studies of plasma nitrided austenitic stainless steel.

    Science.gov (United States)

    Stróz, D; Psoda, M

    2010-03-01

    Cross-sectional transmission electron microscopy and X-ray phase analysis were used to study the structure of a layer formed during nitriding the AISI 316L stainless steel at temperature 440 degrees C. It was found that the applied treatment led to the formation of 6-microm-thick layer of the S-phase. There is no evidence of CrN precipitation. The X-ray diffraction experiments proved that the occurred austenite lattice expansion - due to nitrogen atoms - depended on the crystallographic direction. The cross-sectional transmission electron microscopy studies showed that the layer consisted of a single cubic phase that contained a lot of defects such as dislocations, stacking faults, slip bands and twins. The high-resolution electron microscopy observations were applied to study the defect formation due to the nitriding process. It was shown that the presence of great number of stacking faults leads to formation of nanotwins. Weak, forbidden {100} reflections were still another characteristic feature of the S-phase. These were not detected in the X-ray spectra of the phase. Basing on the high-resolution electron microscopy studies it can be suggested that the short-range ordering of the nitrogen atoms in the octahedral sites inside the f.c.c. matrix lattice takes place and gives rise to appearance of these spots. It is suggested that the cubic lattice undergoes not only expansion but also slight rombohedral distortion that explains differences in the lattice expansion for different crystallographic directions.

  20. Resonant and Ground Experimental Study on the Microwave Plasma Thruster

    Science.gov (United States)

    Yang, Juan; He, Hongqing; Mao, Genwang; Qu, Kun; Tang, Jinlan; Han, Xianwei

    2002-01-01

    chemistry. Therefore, the application of EP for the attitude control and station keeping of satellite, the propulsion of deep space exploration craft allows to reduce substantially the mass of on-board propellant and the launching cost. The EP research is now receiving high interest everywhere. microwave generating subsystem, the propellant supplying subsystem and the resonator (the thruster). Its principle is that the magnetron of the microwave generating subsystem transfers electric energy into microwave energy at given frequency which is introduced into a resonant cavity. Microwave will resonate within the cavity when it is adjusted. When the propellant gas (N2, Ar, He, NH3 or H2) is put into the cavity and coupled with microwave energy at the maximal electric intensity place, it will be broken down to form free-floating plasma, which flows from nozzle with high speed to produce thrust. Its characteristic is high efficiency, simple power supply and without electrode ablation, its specific impulse is greater than arcjet. 2450MHz, have been developed. The microwave generating subsystem and resonator of lower power MPT, 70-200W, are coaxial. The resonator with TEM resonating mode is section of coaxial wave-guide, of which one end is shorted, another is semi-opened. The maximal electric intensity field is in the lumped capacity formed between the end surface of inner conductor, retracting in the cavity, and the semi-opened surface of outer conductor. It provides favorable condition for gas breakdown. The microwave generating system and resonator of middle power MPT, 500-1,000W, are wave-guide cavity. The resonator with TM011 resonating mode is cylinder wave-guide cavity, of which two end surface are shorted. The distribution of electromagnetic field is axial symmetry, its maximal electric intensity field locates on the axis and closes to the exit of nozzle, where the propellant gas is breakdown to form free floating plasma. The plasma is free from the wall of

  1. Modelling of microwave induced plasmas : the interplay between electromagnetism, plasma chemistry and transport

    NARCIS (Netherlands)

    Jimenez-Diaz, M.

    2011-01-01

    In this thesis we report on a theoretical/numerical study that is concerned with Microwave Induced Plasmas (MIPs) in general, and the application of a MIP to the Plasma-activated Chemical Vapour Deposition (PCVD) process that is used at Draka Comteq for the production of optical fibres in

  2. Modelling of diamond deposition microwave cavity generated plasmas

    International Nuclear Information System (INIS)

    Hassouni, K; Silva, F; Gicquel, A

    2010-01-01

    Some aspects of the numerical modelling of diamond deposition plasmas generated using microwave cavity systems are discussed. The paper mainly focuses on those models that allow (i) designing microwave cavities in order to optimize the power deposition in the discharge and (ii) estimating the detailed plasma composition in the vicinity of the substrate surface. The development of hydrogen plasma models that may be used for the self-consistent simulation of microwave cavity discharge is first discussed. The use of these models for determining the plasma configuration, composition and temperature is illustrated. Examples showing how to use these models in order to optimize the cavity structure and to obtain stable process operations are also given. A transport model for the highly reactive H 2 /CH 4 moderate pressure discharges is then presented. This model makes possible the determination of the time variation of plasma composition and temperature on a one-dimensional domain located on the plasma axis. The use of this model to analyse the transport phenomena and the chemical process in diamond deposition plasmas is illustrated. The model is also utilized to analyse pulsed mode discharges and the benefit they can bring as far as diamond growth rate and quality enhancement are concerned. We, in particular, show how the model can be employed to optimize the pulse waveform in order to improve the deposition process. Illustrations on how the model can give estimates of the species density at the growing substrate surface over a wide domain of deposition conditions are also given. This brings us to discuss the implication of the model prediction in terms of diamond growth rate and quality. (topical review)

  3. Effect of residual stresses on fatigue strength of plasma nitrided 4140 steel

    International Nuclear Information System (INIS)

    Aghazadeh, J.; Amidi, M.R.

    2004-01-01

    Almost every method that has been presented to determine residual stress has some limitation and complexities. The aim of this work is to present a new, yet simple method so called strain indentation for measuring the residual stresses particularly in thin layers. In this method in addition to the precision measurements, components of residual stress at different directions may be determined. AISI 4140 steel specimens nitrided at 350 d ig C , 450 d ig C and 550 d ig C for 5 hours in the mixture of 75% nitrogen- 25% hydrogen gas. The, components of residual stress in the radials axial and hoop directions in the nitrided layer were determined considering the elastic strain recovery after removal of residual stress inducer(i.e. the nitrided layer). Fatigue strength of the nitrided specimens was obtained by plotting the S-N curves and fractographic studies carried out on the fracture surface of the specimens. The effect of residual stress on the stress pattern was simulated. The calculated residual stress components were in the range of 40-210 Mpa and the radial components of residual stress were more than the other two directions. Maximum fatigue strength improvement of up to 110% was observed in the plasma nitrided specimens at 550 d ig C and also 40% improvement in fatigue strength was detected by increasing the nitriding temperature from 350 d ig C to 550 d ig C . This was due to 100% increase in residual stress. Fatigue crack growth velocity in the hoop direction was more than that of radial direction. This seems to be due to higher radial residual stress component compared with the hoop stress component in the sub layer

  4. Kinetic computer modeling of microwave surface-wave plasma production

    International Nuclear Information System (INIS)

    Ganachev, Ivan P.

    2004-01-01

    Kinetic computer plasma modeling occupies an intermediate position between the time consuming rigorous particle dynamic simulation and the fast but rather rough cold- or warm-plasma fluid models. The present paper reviews the kinetic modeling of microwave surface-wave discharges with accent on recent kinetic self-consistent models, where the external input parameters are reduced to the necessary minimum (frequency and intensity of the applied microwave field and pressure and geometry of the discharge vessel). The presentation is limited to low pressures, so that Boltzmann equation is solved in non-local approximation and collisional electron heating is neglected. The numerical results reproduce correctly the bi-Maxwellian electron energy distribution functions observed experimentally. (author)

  5. Plasma Electronics. Theoretical and Experimental Investigations of Plasma Nonlinearity in the Powerful Microwave Oscillators

    International Nuclear Information System (INIS)

    Bliokh, Yu.P.

    2001-01-01

    During more than 50 years of Plasma Electronics development a great number of experimental and theoretical results have been achieved. These results allow understanding of physical processes which originate under charged particles beams interaction with a plasma. However, one essential aspect of such interaction remains insufficiently studied. The question is about a correlation between conditions of microwave excitation by a beam in plasma and plasma parameters. Each of these effects, namely the influence of plasma parameters on conditions of microwave excitation by a beam and plasma parameters variations under the influence of propagating microwave radiation are well known and investigated enough. However their common action under beam-plasma instability (BPI) development were not studied systematically, although the role of such reciprocal influence on character of these processes may be very large. The aim of this report is a review of recent theoretical and experimental investigations of such plasma nonlinearity in plasma-filled trawling-wave tubes. N.M.Zemlyansky and E.A.Kornilov have done experiments in Kharkov Institute of Physics and Technology (KhPhTI). Development of the theoretical model was started in KhPhTI (Yu.P.Bliokh, Ya.B.Fainberg, M.G.Lyubarsky, and V.O.Podobinsky) and continues by author in Technion. The developed theory takes into account two main reasons of the plasma density redistribution: high frequency pressure (HFP) force which ''push out'' plasma from the regions with increased microwave amplitude, or microwave discharge, which appears in the region where amplitude is large enough. Displaced (under HFP action) or additionally originating (under (BPD) development) plasma propagates from the disturbance source in the form of slow plasma waves (for example, ion-sound or magneto-sound waves), and the BPI develops in the nonhomogeneous plasma. It changes both magnitude and longitudinal distribution of excited microwave amplitude. As a result

  6. Synthesis of nanocrystalline magnesium nitride (Mg3N2) powder using thermal plasma

    International Nuclear Information System (INIS)

    Kim, Dong-Wook; Kim, Tae-Hee; Park, Hyun-Woo; Park, Dong-Wha

    2011-01-01

    Nanocrystalline magnesium nitride (Mg 3 N 2 ) powder was synthesized from bulk magnesium by thermal plasma at atmospheric pressure. Magnesium vapor was generated through heating the bulk magnesium by DC plasma jet and reacted with ammonia gas. Injecting position and flow rates of ammonia gas were controlled to investigate an ideal condition for Mg 3 N 2 synthesis. The synthesized Mg 3 N 2 was cooled and collected on the chamber wall. Characteristics of the synthesized powders for each experimental condition were analyzed by X-ray diffractometer (XRD), scanning electron microscopy (SEM) and thermogravity analysis (TGA). In absence of NH 3 , magnesium metal powder was formed. The synthesis with NH 3 injection in low temperature region resulted in a formation of crystalline magnesium nitride with trigonal morphology, whereas the mixture of magnesium metal and amorphous Mg 3 N 2 was formed when NH 3 was injected in high temperature region. Also, vaporization process of magnesium was discussed.

  7. Thermal Plasma Synthesis of Crystalline Gallium Nitride Nanopowder from Gallium Nitrate Hydrate and Melamine

    Directory of Open Access Journals (Sweden)

    Tae-Hee Kim

    2016-02-01

    Full Text Available Gallium nitride (GaN nanopowder used as a blue fluorescent material was synthesized by using a direct current (DC non-transferred arc plasma. Gallium nitrate hydrate (Ga(NO33∙xH2O was used as a raw material and NH3 gas was used as a nitridation source. Additionally, melamine (C3H6N6 powder was injected into the plasma flame to prevent the oxidation of gallium to gallium oxide (Ga2O3. Argon thermal plasma was applied to synthesize GaN nanopowder. The synthesized GaN nanopowder by thermal plasma has low crystallinity and purity. It was improved to relatively high crystallinity and purity by annealing. The crystallinity is enhanced by the thermal treatment and the purity was increased by the elimination of residual C3H6N6. The combined process of thermal plasma and annealing was appropriate for synthesizing crystalline GaN nanopowder. The annealing process after the plasma synthesis of GaN nanopowder eliminated residual contamination and enhanced the crystallinity of GaN nanopowder. As a result, crystalline GaN nanopowder which has an average particle size of 30 nm was synthesized by the combination of thermal plasma treatment and annealing.

  8. Evaluation of the Effect of Different Plasma-Nitriding Parameters on the Properties of Low-Alloy Steel

    Science.gov (United States)

    Zdravecká, Eva; Slota, Ján; Solfronk, Pavel; Kolnerová, Michaela

    2017-07-01

    This work is concerned with the surface treatment (ion nitriding) of different plasma-nitriding parameters on the characteristics of DIN 1.8519 low-alloy steel. The samples were nitrided from 500 to 570 °C for 5-40 h using a constant 25% N2-75% H2 gaseous mixture. Lower temperature (500-520 °C) favors the formation of compound layers of γ' and ɛ iron nitrides in the surface layers, whereas a monophase γ'-Fe4 N layer can be obtained at a higher temperature. The hardness of this layer can be obtained when nitriding is performed at a higher temperature, and the hardness decreases when the temperature increases to 570 °C. These results indicate that pulsed plasma nitriding is highly efficient at 550 °C and can form thick and hard nitrided layers with satisfactory mechanical properties. The results show the optimized nitriding process at 540 °C for 20 h. This process can be an interesting means of enhancing the surface hardness of tool steels to forge dies compared to stamped steels with zinc coating with a reduced coefficient of friction and improving the anti-sticking properties of the tool surface.

  9. Tungsten nitride coatings obtained by HiPIMS as plasma facing materials for fusion applications

    Czech Academy of Sciences Publication Activity Database

    Tiron, V.; Velicu, I. L.; Porosnicu, C.; Burducea, I.; Dinca, P.; Malinský, Petr

    Roč. 416, SEP (2017), s. 878-884 ISSN 0169-4332 R&D Projects: GA ČR(CZ) GBP108/12/G108; GA MŠk LM2015056 Institutional support: RVO:61389005 Keywords : Tugensten nitride layers * m-HIPIMS * deuterium retention * deuterium plasma jet * thermal desorption spectrometry Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders OBOR OECD: Nuclear physics Impact factor: 3.387, year: 2016

  10. Sputter deposition of tantalum-nitride films on copper using an rf-plasma

    International Nuclear Information System (INIS)

    Walter, K.C.; Fetherston, R.P.; Sridharan, K.; Chen, A.; Shamim, M.M.; Conrad, J.R.

    1994-01-01

    A tantalum-nitride film was successfully deposited at ambient temperature on copper with a modified ion-assisted-deposition (IAD) technique. The process uses an argon and nitrogen plasma to sputter deposit from a tantalum rf-cathode and ion implant the deposited film simultaneously. Both argon and nitrogen ions are used for sputtering and ion implantation. Auger spectroscopy and x-ray diffraction were used to characterize the resulting film

  11. The Interaction of C-Band Microwaves with Large Plasma Sheets

    International Nuclear Information System (INIS)

    Ding Liang; Huo Wenqing; Yang Xinjie; Xu Yuemin

    2012-01-01

    A large plasma sheet 60 cm×60 cm×2 cm in size was generated using a hollow cathode, and measurements were conducted for interactions including transmission, reflection and absorption. With different discharge parameters, plasma sheets can vary and influence microwave strength. Microwave reflection decreases when the discharge current rises, and the opposite occurs in transmission. The C-band microwave is absorbed when it is propagated through large plasma sheets at higher pressure. When plasma density and collision frequency are fitted with incident microwave frequency, a large amount of microwave energy is consumed. Reflection, transmission and absorption all exist simultaneously. Plasma sheets are an attractive alternative to microwave steering at low pressure, and the microwave reflection used in receiving radar can be altered by changing the discharge parameters.

  12. Microwave interaction with hot electron plasmas

    International Nuclear Information System (INIS)

    Tanaka, M.; Fujiwara, M.; Ikegami, H.

    1980-01-01

    A numerical calculation is presented of ray trajectories and cyclotron damping for toroidal plasmas using geometrical optics. In the absorption region, group velocity does not always coincide with the velocity of energy flow, therefore it should be careful to apply the geometrical optics to finite temperature plasmas. In these calculations, attention is paid mainly to the finite temperature effect on ray tracing. Some numerical results for ordinary waves are presented. Second, new cutoff and resonance appear in the plasmas with anisotropic electron temperature. This resonance frequency is shifted from the usual cyclotron resonance by an amount proportional to T 11 /mc 2 , so that one can determine T 11 when this resonance frequency is measured. A simple discussion is given. The results are presented of recent density measurement on Nagoya Bumpy Torus obtained by interferometer system with different frequencies, 35 GHz and 55 GHz. The results are different than each other in T-mode. The possible reasons for these differences are enumerated in this section

  13. Argon plasma treatment of silicon nitride (SiN) for improved antireflection coating on c-Si solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Ghosh, Hemanta; Mitra, Suchismita; Saha, Hiranmay; Datta, Swapan Kumar; Banerjee, Chandan, E-mail: chandanbanerjee74@gmail.com

    2017-01-15

    Highlights: • Antireflection properties of argon plasma treated silicon nitride layer and its effect on crystalline silicon solar cell. • The reduction in reflection due to the formation of a silicon oxynitride/silicon nitride double layer. • EQE reveals a relative increase of 2.72% in J{sub sc} and 4.46% in conversion efficiency. - Abstract: Antireflection properties of argon plasma treated silicon nitride layer and its effect on crystalline silicon solar cell is presented here. Hydrogenated silicon nitride (a-SiN:H) layer has been deposited on a silicon substrate by Plasma Enhanced Chemical Vapour Deposition (PECVD) using a mixture of silane (SiH{sub 4}), ammonia (NH{sub 3}) and hydrogen (H{sub 2}) gases followed by a argon plasma treatment. Optical analysis reveals a significant reduction in reflectance after argon plasma treatment of silicon nitride layer. While FESEM shows nanostructures on the surface of the silicon nitride film, FTIR reveals a change in Si−N, Si−O and N−H bonds. On the other hand, ellipsometry shows the variation of refractive index and formation of double layer. Finally, a c-Si solar cell has been fabricated with the said anti-reflection coating. External quantum efficiency reveals a relative increase of 2.72% in the short circuit current density and 4.46% in conversion efficiency over a baseline efficiency of 16.58%.

  14. MICROWAVE NOISE MEASUREMENT OF ELECTRON TEMPERATURES IN AFTERGLOW PLASMAS

    Energy Technology Data Exchange (ETDEWEB)

    Leiby, Jr., C. C.; McBee, W. D.

    1963-10-15

    Transient electron temperatures in afterglow plasmas were determined for He (5 and 10 torr), Ne, and Ne plus or minus 5% Ar (2.4 and 24 torr) by combining measurements of plasma microwave noise power, and plasma reflectivity and absorptivity. Use of a low-noise parametric preamplifier permitted continuous detection during the afterglow of noise power at 5.5 Bc in a 1 Mc bandwidth. Electron temperature decays were a function of pressure and gas but were slower than predicted by electron energy loss mechanisms. The addition of argon altered the electron density decay in the neon afterglow but the electron temperature decay was not appreciably changed. Resonances in detected noise power vs time in the afterglow were observed for two of the three plasma waveguide geometries studied. These resonances correlate with observed resonances in absorptivity and occur over the same range of electron densities for a given geometry independent of gas type and pressure. (auth)

  15. Properties of plasma flames sustained by microwaves and burning hydrocarbon fuels

    International Nuclear Information System (INIS)

    Hong, Yong Cheol; Uhm, Han Sup

    2006-01-01

    Plasma flames made of atmospheric microwave plasma and a fuel-burning flame were presented and their properties were investigated experimentally. The plasma flame generator consists of a fuel injector and a plasma flame exit connected in series to a microwave plasma torch. The plasma flames are sustained by injecting hydrocarbon fuels into a microwave plasma torch in air discharge. The microwave plasma torch in the plasma flame system can burn a hydrocarbon fuel by high-temperature plasma and high atomic oxygen density, decomposing the hydrogen and carbon containing fuel. We present the visual observations of the sustained plasma flames and measure the gas temperature using a thermocouple device in terms of the gas-fuel mixture and flow rate. The plasma flame volume of the hydrocarbon fuel burners was more than approximately 30-50 times that of the torch plasma. While the temperature of the torch plasma flame was only 868 K at a measurement point, that of the diesel microwave plasma flame with the addition of 0.019 lpm diesel and 30 lpm oxygen increased drastically to about 2280 K. Preliminary experiments for methane plasma flame were also carried out, measuring the temperature profiles of flames along the radial and axial directions. Finally, we investigated the influence of the microwave plasma on combustion flame by observing and comparing OH molecular spectra for the methane plasma flame and methane flame only

  16. Confluence or independence of microwave plasma bullets in atmospheric argon plasma jet plumes

    Science.gov (United States)

    Li, Ping; Chen, Zhaoquan; Mu, Haibao; Xu, Guimin; Yao, Congwei; Sun, Anbang; Zhou, Yuming; Zhang, Guanjun

    2018-03-01

    Plasma bullet is the formation and propagation of a guided ionization wave (streamer), normally generated in atmospheric pressure plasma jet (APPJ). In most cases, only an ionization front produces in a dielectric tube. The present study shows that two or three ionization fronts can be generated in a single quartz tube by using a microwave coaxial resonator. The argon APPJ plumes with a maximum length of 170 mm can be driven by continuous microwaves or microwave pulses. When the input power is higher than 90 W, two or three ionization fronts propagate independently at first; thereafter, they confluence to form a central plasma jet plume. On the other hand, the plasma bullets move independently as the lower input power is applied. For pulsed microwave discharges, the discharge images captured by a fast camera show the ionization process in detail. Another interesting finding is that the strongest lightening plasma jet plumes always appear at the shrinking phase. Both the discharge images and electromagnetic simulations suggest that the confluence or independent propagation of plasma bullets is resonantly excited by the local enhanced electric fields, in terms of wave modes of traveling surface plasmon polaritons.

  17. Spectral characteristics of a relativistic plasma microwave generator

    International Nuclear Information System (INIS)

    Kuzelev, M.V.; Loza, O.T.; Ponomarev, A.V.; Rukhadze, A.A.; Strelkov, P.S.; Ul'yanov, D.K.; Shkvarunets, A.G.

    1996-01-01

    The radiation spectrum of a broad-band relativistic plasma microwave generator, in which a hollow relativistic electron beam is injected into a plasma waveguide consisting of a hollow plasma within a round metallic waveguide is measured experimentally. The radiation spectrum is measured using a wide-aperture calorimetric spectrometer in the frequency range 3-32 GHz. The influence of the plasma density and the beam-plasma gap on the radiation spectrum is investigated. The amplification of the noise electromagnetic radiation when a relativistic electron beam is injected into the plasma waveguide is calculated on the basis of the nonlinear theory. The theory predicts passage from a one-particle generation regime to a collective regime and narrowing of the radiation spectrum as the plasma density and the gap between the hollow beam and the plasma increases. A comparison of the measurement results with the nonlinear theory accounts for several features of the measured spectrum. However, the predicted change in the generation regimes is not observed experimentally. Qualitative arguments are advanced, which explain the observed phenomena and call for further theoretical and experimental research, are advanced

  18. Rf-plasma synthesis of nanosize silicon carbide and nitride. Final report

    Energy Technology Data Exchange (ETDEWEB)

    Buss, R.J.

    1997-02-01

    A pulsed rf plasma technique is capable of generating ceramic particles of 10 manometer dimension. Experiments using silane/ammonia and trimethylchlorosilane/hydrogen gas mixtures show that both silicon nitride and silicon carbide powders can be synthesized with control of the average particle diameter from 7 to 200 nm. Large size dispersion and much agglomeration appear characteristic of the method, in contrast to results reported by another research group. The as produced powders have a high hydrogen content and are air and moisture sensitive. Post-plasma treatment in a controlled atmosphere at elevated temperature (800{degrees}C) eliminates the hydrogen and stabilizes the powder with respect to oxidation or hydrolysis.

  19. Changing in Fatigue Life of 300 M Bainitic Steel After Laser Carburizing and Plasma Nitriding

    Directory of Open Access Journals (Sweden)

    Abdalla Antonio J.

    2018-01-01

    Full Text Available In this work 300M steel samples is used. This high-strength steel is used in aeronautic and aerospace industry and other structural applications. Initially the 300 M steel sample was submitted to a heat treatment to obtain a bainític structure. It was heated at 850 °C for 30 minutes and after that, cooled at 300 °C for 60 minutes. Afterwards two types of surface treatments have been employed: (a using low-power laser CO2 (125 W for introducing carbon into the surface and (b plasma nitriding at a temperature of 500° C for 3 hours. After surface treatment, the metallographic preparation was carried out and the observations with optical and electronic microscopy have been made. The analysis of the coating showed an increase in the hardness of layer formed on the surface, mainly, among the nitriding layers. The mechanical properties were analyzed using tensile and fatigue tests. The results showed that the mechanical properties in tensile tests were strongly affected by the bainitic microstructure. The steel that received the nitriding surface by plasma treatment showed better fatigue behavior. The results are very promising because the layer formed on steel surface, in addition to improving the fatigue life, still improves protection against corrosion and wear.

  20. Plasma deposition of cubic boron nitride films from non-toxic material at low temperatures

    International Nuclear Information System (INIS)

    Karim, M.Z.; Cameron, D.C.; Murphy, M.J.; Hashmi, M.S.J.

    1991-01-01

    Boron nitride has become the focus of a considerable amount of interest because of its properties which relate closely to those of carbon. In particular, the cubic nitride phase has extreme hardness and very high thermal conductivity similar to the properties of diamond. The conventional methods of synthesis use the highly toxic and inflammable gas diborane (B 2 H 6 ) as the reactant material. A study has been made of the deposition of thin films of boron nitride (BN) using non-toxic material by the plasma-assisted chemical vapour deposition technique. The source material was borane-ammonia (BH 3 -NH 3 ) which is a crystalline solid at room temperature with a high vapour pressure. The BH 3 -NH 3 vapour was decomposed in a 13.56 MHz nitrogen plasma coupled either inductively or capacitively with the system. The composition of the films was assessed by measuring their IR absorption when deposited on silicon and KBr substrates. The hexagonal (graphitic) and cubic (diamond-like) allotropes can be distinguished by their characteristic absorption bands which occur at 1365 and 780 cm -1 (hexagonal) and 1070 cm -1 (cubic). We have deposited BN films consisting of a mixture of hexagonal and cubic phases; the relative content of the cubic phase was found to be directly dependent on r.f. power and substrate bias. (orig.)

  1. Radio-frequency plasma nitriding and nitrogen plasma immersion ion implantation of Ti-6Al-4V alloy

    International Nuclear Information System (INIS)

    Wang, S.Y.; Chu, P.K.; Tang, B.Y.; Zeng, X.C.; Wang, X.F.; Chen, Y.B.

    1997-01-01

    Nitrogen ion implantation improves the wear resistance of Ti-6Al-4V alloys by forming a hard TiN superficial passivation layer. However, the thickness of the layer formed by traditional ion implantation is typically 100-200 nm and may not be adequate for many industrial applications. We propose to use radio-frequency (RF) plasma nitriding and nitrogen plasma immersion ion implantation (PIII) to increase the layer thickness. By using a newly designed inductively coupled RF plasma source and applying a series of negative high voltage pulses to the Ti-6Al-4V samples. RF plasma nitriding and nitrogen PIII can be achieved. Our process yields a substantially thicker modified layer exhibiting more superior wear resistance characteristics, as demonstrated by data from micro-hardness testing, pin-on-disc wear testing, scanning electron microscopy (SEM), as well as Auger electron spectroscopy (AES). The performance of our newly developed inductively coupled RF plasma source which is responsible for the success of the experiments is also described. (orig.)

  2. Microwave plasmas generated in bubbles immersed in liquids for hydrocarbons reforming

    International Nuclear Information System (INIS)

    Levko, Dmitry; Sharma, Ashish; Raja, Laxminarayan L

    2016-01-01

    We present a computational modeling study of microwave plasma generated in cluster of atmospheric-pressure argon bubbles immersed in a liquid. We demonstrate that the use of microwaves allows the generation of a dense chemically active non-equilibrium plasma along the gas–liquid interface. Also, microwaves allow generation of overdense plasma in all the bubbles considered in the cluster which is possible because the collisional skin depth of the wave exceeds the bubble dimension. These features of microwave plasma generation in bubbles immersed in liquids are highly desirable for the large-scale liquid hydrocarbon reforming technologies. (letter)

  3. Corrosion-electrochemical characteristics of oxide-carbide and oxide-nitride coatings formed by electrolytic plasma

    International Nuclear Information System (INIS)

    Tomashov, N.D.; Chukalovskaya, T.V.; Medova, I.L.; Duradzhi, V.N.; Plavnik, G.M.

    1990-01-01

    The composition, structure, microhardness and corrosion-electrochemical properties of oxide-carbide and oxide-nitride coatings on titanium in 5n H 2 SO 4 , 50 deg, produced by the method of chemical-heat treatment in electrolytic plasma, containing saturation components of nitrogen and carbon, were investigated. It is shown that the coatings produced have increased hardness, possess high corrosion resistance in sulfuric acid solution at increased temperature, as to their electrochemcial behaviour they are similar to titanium carbide and nitride respectively. It is shown that high corrosion resistance is ensured by electrochemical mechanism of the oxide-carbide and oxide-nitride coating protection

  4. Effects of plasma-deposited silicon nitride passivation on the radiation hardness of CMOS integrated circuits

    International Nuclear Information System (INIS)

    Clement, J.J.

    1980-01-01

    The use of plasma-deposited silicon nitride as a final passivation over metal-gate CMOS integrated circuits degrades the radiation hardness of these devices. The hardness degradation is manifested by increased radiation-induced threshold voltage shifts caused principally by the charging of new interface states and, to a lesser extent, by the trapping of holes created upon exposure to ionizing radiation. The threshold voltage shifts are a strong function of the deposition temperature, and show very little dependence on thickness for films deposited at 300 0 C. There is some correlation between the threshold voltage shifts and the hydrogen content of the PECVD silicon nitride films used as the final passivation layer as a function of deposition temperature. The mechanism by which the hydrogen contained in these films may react with the Si/SiO 2 interface is not clear at this point

  5. Non-equilibrium Microwave Plasma for Efficient High Temperature Chemistry.

    Science.gov (United States)

    van den Bekerom, Dirk; den Harder, Niek; Minea, Teofil; Gatti, Nicola; Linares, Jose Palomares; Bongers, Waldo; van de Sanden, Richard; van Rooij, Gerard

    2017-08-01

    A flowing microwave plasma based methodology for converting electric energy into internal and/or translational modes of stable molecules with the purpose of efficiently driving non-equilibrium chemistry is discussed. The advantage of a flowing plasma reactor is that continuous chemical processes can be driven with the flexibility of startup times in the seconds timescale. The plasma approach is generically suitable for conversion/activation of stable molecules such as CO2, N2 and CH4. Here the reduction of CO2 to CO is used as a model system: the complementary diagnostics illustrate how a baseline thermodynamic equilibrium conversion can be exceeded by the intrinsic non-equilibrium from high vibrational excitation. Laser (Rayleigh) scattering is used to measure the reactor temperature and Fourier Transform Infrared Spectroscopy (FTIR) to characterize in situ internal (vibrational) excitation as well as the effluent composition to monitor conversion and selectivity.

  6. First results on nitriding aluminium alloys in a low-pressure RF plasma

    International Nuclear Information System (INIS)

    Fewell, M.P.; Priest, J.M.; Collins, G.A.; Short, K.T.

    2000-01-01

    Full text: Aluminium alloys are now well established as materials of choice for many commercial applications, especially where strength-to-weight ratio is a critical parameter. However, their more widespread use is inhibited by their low surface hardness. For steels, similar problems can be overcome by nitriding. The nitrogen-rich surface layer has high hardness and load-bearing capacity, and is very well bonded to the substrate. The development of a similar surface-treatment process for aluminium alloys is clearly a desirable goal. It is therefore not surprising that many research groups worldwide have attempted to nitride aluminium. Much of this work studied pure aluminium, a material of no interest for structural applications. Previous investigations into nitriding aluminium alloys' had indifferent results. However, they have served to identify the key issues, which are the importance of a pre-cleaning steps to remove the surface oxide, of impurity control during the nitriding and the desirability of using as low a process temperature as possible. In all of these areas, our process using a low-pressure RF plasma is likely to be competitive. In view of this, we have undertaken a comparative study of a range of commercially available aluminium alloys. All treatments were carried out in the hot-wall nitriding reactor at ANSTO. The samples consist of disks 25mm in diameter and ∼3mm thick which were polished and ultrasonically cleaned in alcohol prior to treatment. The samples were stored in air at all times except when in the nitriding reactor. In a series of treatments, the treatment time was varied in the range 1-16 h and the temperature in the range 350-500 deg C. All treatments were preceeded by a plasma cleaning step in a H 2 /50%Ar mixture for a duration of 1.5-2.0 h while the reactor reached processing temperature. The treatments all used pure N 2 at a pressure of 0.4Pa and a nitrogen flow rate of 12μmol s -1 , with 245W of rf power at 13.56MHz applied to

  7. Structure of non-equilibrium seeded plasma excited with microwave; Micro ha reiki hiheiko seed plasma no kozo

    Energy Technology Data Exchange (ETDEWEB)

    Miyakawa, M.; Murakami, T.; Suekane, T.; Okuno, Y.; Kabashima, S. [Tokyo Institute of Technology, Tokyo (Japan)

    1996-10-20

    Structure of non-equilibrium cesium seeded argon plasma excited with microwave power is simulated numerically. The plasmas produced at suitable microwave powers are found to consist of three regimes, that is, the region limited by charged particle loss toward the wall, the full seed ionization and the diffusion limited regions. The fully ionized seed plasma is produced within the skin-depth determined by the electrical conductivity of the plasma, and the thickness of the fully ionized seed plasma depends on the seed fractions gas pressure and microwave power. 15 refs., 6 figs.

  8. Formation and treatment of materials with microwave plasmas

    International Nuclear Information System (INIS)

    Camps, E.; Garcia, J.L.; Romero, S.

    1996-01-01

    The plasmas technology occupies day by day a more important place in the development of new materials, with properties superior to those developed with conventional techniques. Some processes have already been established and are exploited to industrial level. These basically include the plasmas that are generated within discharges of continuous current, as well as those with alternate fields of frequency in the range of radiofrequency (13.6 MHz usually). Nevertheless, the need to increase the efficiency of the work of plasma used, has given as a result the study of plasmas generated to higher frequencies (2.45 GHz), known as m icrowave plasmas . An important development in the treatment of materials at low pressures and temperature, are those known as microwave discharges of the type of cyclotron resonances of the electrodes, that is, a discharge submerged into a magnetic field. These discharges have the advantage of not including electrodes, they can generate plasmas with higher density of ionized and excited particles, can work under low pressures (∼ 1m Torr), and have higher ionizing coefficient (∼ 1%), than other kind of discharge. With the aim to study the accuracy in work of the microwave discharges in magnetic fields, the National Institute of Nuclear Research (ININ) designed and built a gadget of this type which is actually used in the formation of thin films of the diamond type and of amorphous silicon. At the same time, experiments for nitrating steels, in order to establish the mechanisms that would allow to build samples, with surfaces stronger and resistant to corrosion, at short-time treatments, than those needed, when using other kinds of discharges. (Author)

  9. III Workshop on Microwave Reflectometry for Fusion Plasma Diagnostics

    International Nuclear Information System (INIS)

    Sanchez, J.; Luna, E. de la.

    1997-11-01

    Microwave reflectometry is based on the analysis of the properties (phase delay, time delay, amplitude) of a millimeter wave beam which is launched and reflected at the plasma critical layer. Operation with a fixed frequency beam can be used to analyze the electron density fluctuations in the reflecting region. If several frequencies are launched, information about the density profile can be obtained. In these proceedings, a collection of papers is presented on the issues of density fluctuation studies and profile analysis as well as a special contribution about the development of reflectometry for the ITER project. (Author) 145 refs

  10. III Workshop on Microwave Reflectometry for Fusion Plasma Diagnostics

    Energy Technology Data Exchange (ETDEWEB)

    Sanchez, J; Luna, E de la

    1997-11-01

    Microwave reflectometry is based on the analysis of the properties (phase delay, time delay, amplitude) of a millimeter wave beam which is launched and reflected at the plasma critical layer. Operation with a fixed frequency beam can be used to analyze the electron density fluctuations in the reflecting region. If several frequencies are launched, information about the density profile can be obtained. In these proceedings, a collection of papers is presented on the issues of density fluctuation studies and profile analysis as well as a special contribution about the development of reflectometry for the ITER project. (Author) 145 refs.

  11. Energy distribution and transfer in flowing hydrogen microwave plasmas

    International Nuclear Information System (INIS)

    Chapman, R.A.

    1987-01-01

    This thesis is an experimental investigation of the physical and chemical properties of a hydrogen discharge in a flowing microwave plasma system. The plasma system is the mechanisms utilized in an electrothermal propulsion concept to convert electromagnetic energy into the kinetic energy of flowing hydrogen gas. The plasmas are generated inside a 20-cm ID resonant cavity at a driving frequency of 2.45 GHz. The flowing gas is contained in a coaxially positioned 22-mm ID quartz discharge tube. The physical and chemical properties are examined for absorbed powers of 20-100 W, pressures of 0.5-10 torr, and flow rates of 0-10,000 μ-moles/sec. A calorimetry system enclosing the plasma system to accurately measure the energy inputs and outputs has been developed. The rate of energy that is transferred to the hydrogen gas as it flows through the plasma system is determined as a function of absorbed power, pressure, and flow rate to +/-1.8 W from an energy balance around the system. The percentage of power that is transferred to the gas is found to increase with increasing flow rate, decrease with increasing pressure, and to be independent of absorbed power

  12. Plasma density fluctuation measurements from coherent and incoherent microwave reflection

    International Nuclear Information System (INIS)

    Conway, G.D.; Schott, L.; Hirose, A.

    1996-01-01

    Using the spatial coherency present in a reflected microwave signal (Conway et al 1994 Rev. Sci. Instrum. 65 2920) it is possible to measure a coherent, Γ c , and an incoherent, Γ i , reflection coefficient (proportional to the radar cross section) from a turbulent plasma cutoff layer. Results acquired with a 17 GHz reflectometer from a STOR-M tokamak edge region (r/a ∼ 0.8) give significant Γ c and Γ i , which suggests two-dimensional structure in the reflection layer. Using a 'distorted-mirror' model for the plasma fluctuations, estimates of an effective radial width, σ, and poloidal correlation length, L p , can be derived from the reflection coefficients. STOR-M results typically give a σ of a few millimetres and an L p of a couple of centimetres. (author)

  13. Decontamination of biological warfare agents by a microwave plasma torch

    International Nuclear Information System (INIS)

    Lai, Wilson; Lai, Henry; Kuo, Spencer P.; Tarasenko, Olga; Levon, Kalle

    2005-01-01

    A portable arc-seeded microwave plasma torch running stably with airflow is described and applied for the decontamination of biological warfare agents. Emission spectroscopy of the plasma torch indicated that this torch produced an abundance of reactive atomic oxygen that could effectively oxidize biological agents. Bacillus cereus was chosen as a simulant of Bacillus anthracis spores for biological agent in the decontamination experiments. Decontamination was performed with the airflow rate of 0.393 l/s, corresponding to a maximum concentration of atomic oxygen produced by the torch. The experimental results showed that all spores were killed in less than 8 s at 3 cm distance, 12 s at 4 cm distance, and 16 s at 5 cm distance away from the nozzle of the torch

  14. Optimum design of a microwave interferometer for plasma density measurement

    International Nuclear Information System (INIS)

    Lindberg, L.; Eriksson, A.

    1980-11-01

    Theoretical and practical problems arising in the application of microwave interferometry to density measurements on transient plasmas are discussed. The conditions for unambiquous measurements in a density range as wide as possible are analyzed. It is shown that the initial zero adjustment of the interferometer bridge recommended in many text books is the worst possible choice of initial condition when the aim is high initial sensitivity at low densities. The analytic expressions needed for unambiquous evaluation of any phase shift from a few degrees to several times π (counting of fringes) are derived. The practical design of the interferometer circuit and its inherent error sources due to reflexions and non-ideal component properties are discussed. The results are applied to an interferometer operating at 80 GHz used on a pulsed plasma experiment. The minimum measurable phase shift is 2deg and the range of linear densities that have been measured is = 1 . 10 16 - 3 . 10 18 m -2

  15. Remote plasma-assisted nitridation (RPN): applications to Zr and Hf silicate alloys and Al2O3

    International Nuclear Information System (INIS)

    Hinkle, Chris; Lucovsky, Gerry

    2003-01-01

    Remote plasma-assisted nitridation or RPN is demonstrated to be a processing pathway for nitridation of Zr and Hf silicate alloys, and for Al 2 O 3 , as well. The dependence of nitrogen incorporation on the process pressure is qualitatively similar to what has been reported for the plasma-assisted nitridation of SiO 2 , the lower the process pressure the greater the nitrogen incorporation in the film. The increased incorporation of nitrogen has been correlated with the penetration of the plasma-glow into the process chamber, and the accompanying increase in the concentration of N 2 + ions that participate in the reactions leading to bulk incorporation. The nitrogen incorporation as been studied by Auger electron spectroscopy (AES), secondary ion mass spectrometry (SIMS) and X-ray absorption spectroscopy (XAS)

  16. Mechanical properties and corrosion resistance of supermartensitic stainless steel surfaces nitrided by plasma immersion ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Schibicheski, Bruna Corina Emanuely; Souza, Gelson Biscaia de; Oliveira, Willian Rafael de; Serbena, Francisco Carlos, E-mail: bruna_schibicheski@hotmail.com [Universidade Estadual de Ponta Grossa (UEPG), PR (Brazil); Marino, Cláudia E.B. [Universidade Federal do Paraná (UFPR), Curitiba, PR (Brazil)

    2016-07-01

    Full text: The supermartensitic stainless steel UNS S41426 is employed in marine oil and gas extraction ducts, where it is subjected to severe conditions of temperature, pressure and exposure to corrosive agents (as the H{sub 2}S). In such environments, pitting corrosion is a major cause of degradation of metallic alloys [1]. This work investigated the effectiveness of the nitrogen inlet, attained here by the plasma immersion ion implantation (PIII) technique, in improving the mechanical properties and corrosion resistance of the material surface. Samples were initially austenitized at 1100°C with a subsequent room temperature oil quenching in order to obtain a fully martensitic structure. The nitriding was carried out under 10 kV implantation energy and 30 ms pulse width. The temperatures ranged from 300 °C to 400°C, achieved by controlling the pulse repetition rates. Samples were characterized by X-ray diffraction, energy dispersive X-ray spectroscopy, instrumented indentation, scanning electron microscopy, potentiodynamic anodic polarization tests (in NaCl solution), and cathodic hydrogenation tests (in H{sub 2}SO{sub 4} solution). The PIII nitriding produced stratified layers up to 30 mm thick containing nitrogen expanded martensite and iron nitride phases (γ’-Fe{sub 4}N, ε- Fe{sub 2+x}N), depending on the treatment temperature. Consequently, the surface hardness increased from ∼3GPa (reference) up to ∼13GPa (400°C). Regarding the corrosion resistance, the nitrided surfaces presented a significant improvement as compared with the pristine surface, evidenced by the increase of the corrosion potential, which was also correlated to the hydrogen embrittlement reduction and the subsequent suppression of morphological changes. References: [1] M.G. Fontana, Corrosion Engineering, Singapore: McGraw-Hill, 1987. [2] B.C.E.S. Kurelo et al., Applied Surface Science 349 (2015) 403-414. (author)

  17. Plasma-spray synthesis and characterization of ti-based nitride and oxide nanogranules

    Energy Technology Data Exchange (ETDEWEB)

    Antipas, Georgios S.E., E-mail: gantipas@metal.ntua.gr [School of Mining Engineering and Metallurgy, National Technical University of Athens, Athens (Greece)

    2014-09-15

    The synthesis of nanosized Ti-based nanogranules via plasma spraying is reported. The synthesis route involved use of both nitrogen and oxygen gases with varying results. In the case of nitrogen, a mixture of titanium nitrides were produced, yielding both the Ti2N and the sub-stoichiometric TiN0.61 compounds. In the case of oxygen, both the stoichiometric rutile and TiO ceramic phases were indexed. Based on EDS analysis, even fractional oxygen concentrations caused tungsten impurities which originated from the cathode electrode. The method yielded particle mass median sizes of the order of 15nm and the smallest particles detected were 5nm. (author)

  18. The Influence Of Nitridation Temperature And Time On The Surface Hardness Of AISI 1010 Low Carbon Steels Nitrided By Means Of Plasma Glow Discharge Technique

    International Nuclear Information System (INIS)

    Sujitno, Tjipto; Mujiman, Supardjono

    1996-01-01

    The results of the influence of nitridation temperature and time on the surface hardness of AISI 1010 low carbon steels nitrided by means of plasma glow discharge technique are presented in this paper. The results are the changing of surface hardiness, the changing of surface microstructure and the penetration profile depth. The experiment has been carried out at the temperature 400 o C, 450 o C, 500 o C, 550 o C, 570 o C and 600 o C, whereas the time is 5 minutes, 15 minutes, 40 minutes, 90 minutes and 180 minutes. All the experiments have been carried out at the optimum plasma density condition. The optimum plasma density condition is achieved at the pressure of p = 0.2 torr, when thr gas flow of nitrogen is 0.6 liter/minute and the distance of electrode plate is 4.5 cm. It was found that the optimum hardness of the surface was achieved at the temperature of 570 o C and the time of nitridation was 90 minutes, i.e. 190 KHN

  19. Industrial applications of plasma, microwave and ultrasound techniques : nitrogen-fixation and hydrogenation reactions

    NARCIS (Netherlands)

    Hessel, V.; Cravotto, G.; Fitzpatrick, P.; Patil, B.S.; Lang, J.; Bonrath, W.

    2013-01-01

    The MAPSYN project (Microwave, Acoustic and Plasma assisted SYNtheses) aims at nitrogen-fixation reactions intensified by plasma catalysis and selective hydrogenations intensified by microwaves, possibly assisted by ultrasound. Energy efficiency is the key motif of the project and the call of the

  20. Plasma filamentation and shock wave enhancement in microwave rockets by combining low-frequency microwaves with external magnetic field

    International Nuclear Information System (INIS)

    Takahashi, Masayuki; Ohnishi, Naofumi

    2016-01-01

    A filamentary plasma is reproduced based on a fully kinetic model of electron and ion transports coupled with electromagnetic wave propagation. The discharge plasma transits from discrete to diffusive patterns at a 110-GHz breakdown, with decrease in the ambient pressure, because of the rapid electron diffusion that occurs during an increase in the propagation speed of the ionization front. A discrete plasma is obtained at low pressures when a low-frequency microwave is irradiated because the ionization process becomes more dominant than the electron diffusion, when the electrons are effectively heated by the low-frequency microwave. The propagation speed of the plasma increases with decrease in the incident microwave frequency because of the higher ionization frequency and faster plasma diffusion resulting from the increase in the energy-absorption rate. An external magnetic field is applied to the breakdown volume, which induces plasma filamentation at lower pressures because the electron diffusion is suppressed by the magnetic field. The thrust performance of a microwave rocket is improved by the magnetic fields corresponding to the electron cyclotron resonance (ECR) and its higher-harmonic heating, because slower propagation of the ionization front and larger energy-absorption rates are obtained at lower pressures. It would be advantageous if the fundamental mode of ECR heating is coupled with a lower frequency microwave instead of combining the higher-harmonic ECR heating with the higher frequency microwave. This can improve the thrust performance with smaller magnetic fields even if the propagation speed increases because of the decrease in the incident microwave frequency.

  1. Plasma filamentation and shock wave enhancement in microwave rockets by combining low-frequency microwaves with external magnetic field

    Energy Technology Data Exchange (ETDEWEB)

    Takahashi, Masayuki, E-mail: m.takahashi@al.t.u-tokyo.ac.jp [Department of Aeronautics and Astronautics, The University of Tokyo, Bunkyo-ku 113-8656 (Japan); Ohnishi, Naofumi [Department of Aerospace Engineering, Tohoku University, Sendai 980-8579 (Japan)

    2016-08-14

    A filamentary plasma is reproduced based on a fully kinetic model of electron and ion transports coupled with electromagnetic wave propagation. The discharge plasma transits from discrete to diffusive patterns at a 110-GHz breakdown, with decrease in the ambient pressure, because of the rapid electron diffusion that occurs during an increase in the propagation speed of the ionization front. A discrete plasma is obtained at low pressures when a low-frequency microwave is irradiated because the ionization process becomes more dominant than the electron diffusion, when the electrons are effectively heated by the low-frequency microwave. The propagation speed of the plasma increases with decrease in the incident microwave frequency because of the higher ionization frequency and faster plasma diffusion resulting from the increase in the energy-absorption rate. An external magnetic field is applied to the breakdown volume, which induces plasma filamentation at lower pressures because the electron diffusion is suppressed by the magnetic field. The thrust performance of a microwave rocket is improved by the magnetic fields corresponding to the electron cyclotron resonance (ECR) and its higher-harmonic heating, because slower propagation of the ionization front and larger energy-absorption rates are obtained at lower pressures. It would be advantageous if the fundamental mode of ECR heating is coupled with a lower frequency microwave instead of combining the higher-harmonic ECR heating with the higher frequency microwave. This can improve the thrust performance with smaller magnetic fields even if the propagation speed increases because of the decrease in the incident microwave frequency.

  2. High-density plasma etching of III-nitrides: Process development, device applications and damage remediation

    Science.gov (United States)

    Singh, Rajwinder

    Plasma-assisted etching is a key technology for III-nitride device fabrication. The inevitable etch damage resulting from energetic pattern transfer is a challenge that needs to be addressed in order to optimize device performance and reliability. This dissertation focuses on the development of a high-density inductively-coupled plasma (ICP) etch process for III-nitrides, the demonstration of its applicability to practical device fabrication using a custom built ICP reactor, and development of techniques for remediation of etch damage. A chlorine-based standard dry etch process has been developed and utilized in fabrication of a number of electronic and optoelectronic III-nitride devices. Annealing studies carried out at 700°C have yielded the important insight that the annealing time necessary for making good-quality metal contacts to etch processed n-GaN is very short (water, prior to metallization, removes some of the etch damage and is helpful in recovering contact quality. In-situ treatment consisting of a slow ramp-down of rf bias at the end of the etch is found to achieve the same effect as the ex-situ treatment. This insitu technique is significantly advantageous in a large-scale production environment because it eliminates a process step, particularly one involving treatment in hydrochloric acid. ICP equipment customization for scaling up the process to full 2-inch wafer size is described. Results on etching of state of the art 256 x 256 AlGaN focal plane arrays of ultraviolet photodetectors are reported, with excellent etch uniformity over the wafer area.

  3. Moessbauer spectroscopy study on the corrosion resistance of plasma nitrided ASTM F138 stainless steel in chloride solution

    International Nuclear Information System (INIS)

    Souza, S.D. de; Olzon-Dionysio, M.; Basso, R.L.O.; Souza, S. de

    2010-01-01

    Plasma nitriding of ASTM F138 stainless steel samples has been carried out using dc glow discharge under 80% H 2 -20% N 2 gas mixture, at 673 K, and 2, 4, and 7 h time intervals, in order to investigate the influence of treatment time on the microstructure and the corrosion resistance properties. The samples were characterized by scanning electron microscopy, glancing angle X-ray diffraction and conversion electron Moessbauer spectroscopy, besides electrochemical tests in NaCl aerated solution. A modified layer of about 6 μm was observed for all the nitrided samples, independent of nitriding time. The X-ray diffraction analysis shows broad γ N phase peaks, signifying a great degree of nitrogen supersaturation. Besides γ N, the Moessbauer spectroscopy results indicated the occurrence of γ' and ε phases, as well as some other less important phases. Corrosion measurements demonstrate that the plasma nitriding time affects the corrosion resistance and the best performance is reached at 4 h treatment. It seems that the ε/γ' fraction ratio plays an important role on the resistance corrosion. Additionally, the Moessbauer spectroscopy was decisive in this study, since it was able to identify and quantify the iron phases that influence the corrosion resistance of plasma nitrided ASTM F138 samples.

  4. Nucleation of microwave plasma CVD diamond on molybdenum (Mo) substrate

    International Nuclear Information System (INIS)

    Inderjeet, K.; Ramesh, S.

    2000-01-01

    Molybdenum is a metal, which is gaining increasing significance in industrial applications. The main use of Mo is as all alloying element added in small amounts to steel, irons and non- ferrous alloys in order to enhance the strength, toughness and wear resistance. Mo is also vastly being employed in the automotive and aircraft industries, mainly due to its low coefficient of friction. Diamond, on be other hand, is a unique material for innumerable applications because of its usual combination of physical and chemical properties. Several potential applications can be anticipated for diamond in many sectors including electronics, optics, as protective corrosion resistant coatings, cutting tools, etc. With the enhancement in science and technology, diamond microcrystals and thin films are now being produced from the vapour phase by a variety of chemical vapour deposition (CVD) techniques; such as microwave plasma CVD. With such technology being made available, it is envisage that diamond-coated molybdenum would further enhance the performance and to open up new avenue for Mo in various industries. Therefore, it is the aim of the present work to study the nucleation and growth of diamond particles on Mo surface by employing microwave plasma CVD (MAPCVD). In the present work, diamond deposition was carried out in several stages by varying the deposition distance. The nucleation and growth rate were studied using scanning electron microscopy (SEM). In addition, the existence of diamond was verified by X-ray diffraction (XRD) analysis. It has been found that the nucleation and growth rate of diamond particles were influenced by the deposition height between the substrate and plasma. Under the optimum condition, well defined diamond crystallites distributed homogeneously throughout the surface, could be obtained. Some of the important parameters controlling the deposition and growth of diamond particles on Mo surface are discussed. (author)

  5. The low-cost microwave plasma sources for science and industry applications

    Science.gov (United States)

    Tikhonov, V. N.; Aleshin, S. N.; Ivanov, I. A.; Tikhonov, A. V.

    2017-11-01

    Microwave plasma torches proposed in the world market are built according to a scheme that can be called classical: power supply - magnetron head - microwave isolator with water load - reflected power meter - matching device - actual plasma torch - sliding short circuit. The total cost of devices from this list with a microwave generator of 3 kW in the performance, for example, of SAIREM (France), is about 17,000 €. We have changed the classical scheme of the microwave plasmathrone and optimised design of the waveguide channel. As a result, we can supply simple and reliable sources of microwave plasma (complete with our low-budget microwave generator up to 3 kW and a simple plasmathrone of atmospheric pressure) at a price from 3,000 €.

  6. Diagnosis of Unmagnetized Plasma Electron Number Density and Electron-neutral Collision Frequency by Using Microwave

    International Nuclear Information System (INIS)

    Yuan Zhongcai; Shi Jiaming; Xu Bo

    2005-01-01

    The plasma diagnostic method using the transmission attenuation of microwaves at double frequencies (PDMUTAMDF) indicates that the frequency and the electron-neutral collision frequency of the plasma can be deduced by utilizing the transmission attenuation of microwaves at two neighboring frequencies in a non-magnetized plasma. Then the electron density can be obtained from the plasma frequency. The PDMUTAMDF is a simple method to diagnose the plasma indirectly. In this paper, the interaction of electromagnetic waves and the plasma is analyzed. Then, based on the attenuation and the phase shift of a microwave in the plasma, the principle of the PDMUTAMDF is presented. With the diagnostic method, the spatially mean electron density and electron collision frequency of the plasma can be obtained. This method is suitable for the elementary diagnosis of the atmospheric-pressure plasma

  7. Design and construction of automatic operating system of double chamber plasma nitriding device PLC based

    International Nuclear Information System (INIS)

    Saminto; Slamet Santosa; Eko Priyono

    2012-01-01

    The automatic operating system of double chamber plasma nitriding device has been done. The system is used for operating double chamber plasma nitriding automatically as according to the standard operating procedure by pressing push button on the human machine interface (HMI). The system consists of hardware and software. The hardware was constructed using main components T100MD1616+ PLC module and supported by temperature signal conditioner module, Wheatstone bridge module, isolated amplifier module and EMS 30A H Bridge motor driver module. A software program that is planted on T100MD1616+ PLC using ladder diagrams and Tbasic program. Test system functions performed by inserting a set values of temperature and pressure by pressing the button on the human machine interface (HMI). The test results show that the temperature control with a set of values 100 °C obtained stable coverage of 98 °C to 102 °C, (Δ ± 2 °C) with a 2% tolerance and the output voltage of the DAC is 2.436 volts to 2.913 volts. The pressure control with a set of values 2.169 x 10 -1 mbar obtained stable coverage of 1.995 x 10 -1 mbar to 2.205 x 10 -1 mbar, (Δ ± 0.105 x 10 -1 mbar) with a 5% tol. (author)

  8. Microwave plasma for materials treatment; Plasmas de microondas para tratamiento de materiales

    Energy Technology Data Exchange (ETDEWEB)

    Camps, E.; Garcia, J.L.; Muhl, S.; Alvarez F, O.; Chavez C, J. [Instituto Nacional de Investigaciones Nucleares, A.P. 18-1027, 11801 Mexico D.F. (Mexico)

    1997-07-01

    The microwave discharges of the Electron Cyclotron Resonance (Ecr) type are capable to generate plasma with relatively high ionization coefficients which can vary between 1 and 10 % also they are realized in low pressures at 10 {sup -4} Torr. order generating at this time high concentrations of neutral excited chemical species which result in that the chemical processes can be realized with much greater velocity as in another systems. In this work it was studied and characterized a microwave discharge type Ecr using for this electric probes and optical emission spectroscopy. The characterization was carried out with the purpose of optimizing the plasma parameters and to establish a control over the same one doing so that the experiments have a greater reproducibility and a major work efficiency. (Author)

  9. Nitriding of Ti substrate using energetic ions from plasma focus device

    International Nuclear Information System (INIS)

    Henriquez, A; Bhuyan, H; Favre, M; Bora, B; Wyndham, E; Chuaqui, H; Mändl, S; Gerlach, J W; Manova, D

    2012-01-01

    Plasma Focus (PF) discharge is a pulsed plasma producing discharge that generates high temperature and high density plasma for a short duration. PF devices are known to emit intense ion beams pulses of characteristic energy in the keV to a few MeV range, in a time scale of tens of nanoseconds. We have previously investigated the ion flux and energy spectrum of ion beams emitted from a low energy PF, operating at 20 kV, with 1.8 kJ stored energy. It was observed that the ion beams have wide range of energy and intensity spectra with a clear angular anisotropy. Due to the wide range of ion energy and intensity spectra PF has become a subject of current interest for its applications in material sciences including surface modification and thin film deposition. The purpose of this study is the formation of titanium nitride (TiN) thin film and to investigate the structural properties of the TiN thin films in terms of PF angular positions. Substrates like Ti and Ti/Si were nitrided in a 1.8 kJ PF device at different angular positions with respect to the PF axis in order to correlate their surface properties with ion beam parameters. Preliminary characterizations of the ion implanted substrates have been conducted, using SEM, EDX and XRD. Our results indicate the formation of nanocrystalline TiN thin film only in certain angular positions. Angular dependency of the surface morphology was observed, which shows that the surface features strongly depends on ion beam energy and flux. With increasing angular positions, a reduction in the deposition rate and the sputter rate is observed. A pronounced nanostructured surface is only observed at the axis of the pinched plasma column, indicating the dominant role of sputtering and perhaps melting and fast re-crystallization of the surface in creating the nanostructures.

  10. The effect of plasma density profile on the backscatter of microwaves from a plasma-covered plane conductor

    International Nuclear Information System (INIS)

    Destler, W.W.; Singh, A.; Rodgers, J.

    1993-01-01

    In order to gain further insight into the mechanism of anomalous absorption of microwaves in a pulsed plasma column, the latter was studied using single and double Langmuir probes. Graphs of plasma potential recorded by floating Langmuir probes as a function of time were obtained for a range of pressure of the background gas and at different distances from the plasma-covered plane-conducting plate. From this data, two main components of the plasma have been identified. The first appears earlier, exhibits greater fluctuations and is shorter in duration than the second component. The presence of these two plasma components is consistent with earlier observations obtained from transverse transmission measurements of microwaves through the plasma. Variations in the envelopes of these two components as experimental conditions are changed will be presented. Microwave backscatter measurements under varying conditions of plasma-density profile and ambient gas pressure will also be presented

  11. Eigenmodes of a microwave cavity partially filled with an anisotropic hot plasma

    International Nuclear Information System (INIS)

    Shoucri, M.M.; Gagne, R.R.J.

    1978-01-01

    The eigenmodes of a microwave cavity, which contains a uniform hot plasma with anisotropic temperature, are determined using the linearized fluid equations together with Maxwell's equations. Conditions are discussed under which hot plasma mode and the cold plasma mode are decoupled. The frequency shift of the microwave cavity is calculated and the theoretical results are shown to be in very good qualitative agreement with published experimental results obtained for the TM 010 mode. (author)

  12. Low-temperature graphene synthesis using microwave plasma CVD

    International Nuclear Information System (INIS)

    Yamada, Takatoshi; Kim, Jaeho; Ishihara, Masatou; Hasegawa, Masataka

    2013-01-01

    The graphene chemical vapour deposition (CVD) technique at substrate temperatures around 300 °C by a microwave plasma sustained by surface waves (surface wave plasma chemical vapour deposition, SWP-CVD) is discussed. A low-temperature, large-area and high-deposition-rate CVD process for graphene films was developed. It was found from Raman spectra that the deposited films on copper (Cu) substrates consisted of high-quality graphene flakes. The fabricated graphene transparent conductive electrode showed uniform optical transmittance and sheet resistance, which suggests the possibility of graphene for practical electrical and optoelectronic applications. It is intriguing that graphene was successfully deposited on aluminium (Al) substrates, for which we did not expect the catalytic effect to decompose hydrocarbon and hydrogen molecules. We developed a roll-to-roll SWP-CVD system for continuous graphene film deposition towards industrial mass production. A pair of winder and unwinder systems of Cu film was installed in the plasma CVD apparatus. Uniform Raman spectra were confirmed over the whole width of 297 mm of Cu films. We successfully transferred the deposited graphene onto PET films, and confirmed a transmittance of about 95% and a sheet resistance of less than 7 × 10 5 Ω/sq.

  13. Low-temperature graphene synthesis using microwave plasma CVD

    Science.gov (United States)

    Yamada, Takatoshi; Kim, Jaeho; Ishihara, Masatou; Hasegawa, Masataka

    2013-02-01

    The graphene chemical vapour deposition (CVD) technique at substrate temperatures around 300 °C by a microwave plasma sustained by surface waves (surface wave plasma chemical vapour deposition, SWP-CVD) is discussed. A low-temperature, large-area and high-deposition-rate CVD process for graphene films was developed. It was found from Raman spectra that the deposited films on copper (Cu) substrates consisted of high-quality graphene flakes. The fabricated graphene transparent conductive electrode showed uniform optical transmittance and sheet resistance, which suggests the possibility of graphene for practical electrical and optoelectronic applications. It is intriguing that graphene was successfully deposited on aluminium (Al) substrates, for which we did not expect the catalytic effect to decompose hydrocarbon and hydrogen molecules. We developed a roll-to-roll SWP-CVD system for continuous graphene film deposition towards industrial mass production. A pair of winder and unwinder systems of Cu film was installed in the plasma CVD apparatus. Uniform Raman spectra were confirmed over the whole width of 297 mm of Cu films. We successfully transferred the deposited graphene onto PET films, and confirmed a transmittance of about 95% and a sheet resistance of less than 7 × 105 Ω/sq.

  14. Hydrogen sulfide waste treatment by microwave plasma-chemistry

    Energy Technology Data Exchange (ETDEWEB)

    Harkness, J.B.L.; Doctor, R.D.

    1994-03-01

    A waste-treatment process that recovers both hydrogen and sulfur from industrial acid-gas waste streams is being developed to replace the Claus technology, which recovers only sulfur. The proposed process is derived from research reported in the Soviet technical literature and uses microwave (or radio-frequency) energy to initiate plasma-chemical reactions that dissociate hydrogen sulfide into elemental hydrogen and sulfur. This process has several advantages over the current Claus-plus-tail-gas-cleanup technology, which burns the hydrogen to water. The primary advantage of the proposal process is its potential for recovering and recycling hydrogen more cheaply than the direct production of hydrogen. Since unconverted hydrogen sulfide is recycled to the plasma reactor, the plasma-chemical process has the potential for sulfur recoveries in excess of 99% without the additional complexity of the tail-gas-cleanup processes associated with the Claus technology. There may also be some environmental advantages to the plasma-chemical process, because the process purge stream would primarily be the carbon dioxide and water contained in the acid-gas waste stream. Laboratory experiments with pure hydrogen sulfide have demonstrated the ability of the process to operate at or above atmospheric pressure with an acceptable hydrogen sulfide dissociation energy. Experiments with a wide range of acid-gas compositions have demonstrated that carbon dioxide and water are compatible with the plasma-chemical dissociation process and that they do not appear to create new waste-treatment problems. However, carbon dioxide does have negative impacts on the overall process. First, it decreases the hydrogen production, and second, it increases the hydrogen sulfide dissociation energy.

  15. Nitrogen-doped graphene by microwave plasma chemical vapor deposition

    International Nuclear Information System (INIS)

    Kumar, A.; Voevodin, A.A.; Paul, R.; Altfeder, I.; Zemlyanov, D.; Zakharov, D.N.; Fisher, T.S.

    2013-01-01

    Rapid synthesis of nitrogen-doped, few-layer graphene films on Cu foil is achieved by microwave plasma chemical vapor deposition. The films are doped during synthesis by introduction of nitrogen gas in the reactor. Raman spectroscopy, X-ray photoelectron spectroscopy, transmission electron microscopy and scanning tunneling microscopy reveal crystal structure and chemical characteristics. Nitrogen concentrations up to 2 at.% are observed, and the limit is linked to the rigidity of graphene films on copper surfaces that impedes further nitrogen substitutions of carbon atoms. The entire growth process requires only a few minutes without supplemental substrate heating and offers a promising path toward large-scale synthesis of nitrogen-doped graphene films. - Highlights: ► Rapid synthesis of nitrogen doped few layer graphene on Cu foil. ► Defect density increment on 2% nitrogen doping. ► Nitrogen doped graphene is a good protection to the copper metallic surface

  16. Nitrogen-doped graphene by microwave plasma chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kumar, A., E-mail: kumar50@purdue.edu [Birck Nanotechnolgy Center, Purdue University, West Lafayette, IN 47907 (United States); Voevodin, A.A. [Birck Nanotechnolgy Center, Purdue University, West Lafayette, IN 47907 (United States); Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433 (United States); Paul, R. [Birck Nanotechnolgy Center, Purdue University, West Lafayette, IN 47907 (United States); Altfeder, I. [Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433 (United States); Zemlyanov, D.; Zakharov, D.N. [Birck Nanotechnolgy Center, Purdue University, West Lafayette, IN 47907 (United States); Fisher, T.S., E-mail: tsfisher@purdue.edu [Birck Nanotechnolgy Center, Purdue University, West Lafayette, IN 47907 (United States); Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433 (United States)

    2013-01-01

    Rapid synthesis of nitrogen-doped, few-layer graphene films on Cu foil is achieved by microwave plasma chemical vapor deposition. The films are doped during synthesis by introduction of nitrogen gas in the reactor. Raman spectroscopy, X-ray photoelectron spectroscopy, transmission electron microscopy and scanning tunneling microscopy reveal crystal structure and chemical characteristics. Nitrogen concentrations up to 2 at.% are observed, and the limit is linked to the rigidity of graphene films on copper surfaces that impedes further nitrogen substitutions of carbon atoms. The entire growth process requires only a few minutes without supplemental substrate heating and offers a promising path toward large-scale synthesis of nitrogen-doped graphene films. - Highlights: ► Rapid synthesis of nitrogen doped few layer graphene on Cu foil. ► Defect density increment on 2% nitrogen doping. ► Nitrogen doped graphene is a good protection to the copper metallic surface.

  17. Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma.

    Science.gov (United States)

    Knoops, Harm C M; Braeken, Eline M J; de Peuter, Koen; Potts, Stephen E; Haukka, Suvi; Pore, Viljami; Kessels, Wilhelmus M M

    2015-09-09

    Atomic layer deposition (ALD) of silicon nitride (SiNx) is deemed essential for a variety of applications in nanoelectronics, such as gate spacer layers in transistors. In this work an ALD process using bis(tert-butylamino)silane (BTBAS) and N2 plasma was developed and studied. The process exhibited a wide temperature window starting from room temperature up to 500 °C. The material properties and wet-etch rates were investigated as a function of plasma exposure time, plasma pressure, and substrate table temperature. Table temperatures of 300-500 °C yielded a high material quality and a composition close to Si3N4 was obtained at 500 °C (N/Si=1.4±0.1, mass density=2.9±0.1 g/cm3, refractive index=1.96±0.03). Low wet-etch rates of ∼1 nm/min were obtained for films deposited at table temperatures of 400 °C and higher, similar to that achieved in the literature using low-pressure chemical vapor deposition of SiNx at >700 °C. For novel applications requiring significantly lower temperatures, the temperature window from room temperature to 200 °C can be a solution, where relatively high material quality was obtained when operating at low plasma pressures or long plasma exposure times.

  18. Plasma nitriding of CA-6NM steel: effect of H2 + N2 gas mixtures in nitride layer formation for low N2 contents at 500 ºC

    Directory of Open Access Journals (Sweden)

    Angela Nardelli Allenstein

    2010-12-01

    Full Text Available This work aims to characterize the phases, thickness, hardness and hardness profiles of the nitride layers formed on the CA-6NM martensitic stainless steel which was plasma nitrided in gas mixtures containing different nitrogen amounts. Nitriding was performed at 500 ºC temperature, and 532 Pa (4 Torr pressure, for gas mixtures of 5% N2 + 95% H2, 10% N2 + 90% H2, and 20% N2 + 80% H2, and 2 hours nitriding time. A 6 hours nitriding time condition for gas mixture of 5% N2 + 95% H2 was also studied. Nitrided samples results were compared with non-nitrided condition. Thickness and microstructure of the nitrided layers were characterized by optical microscopy (OM, using Villela and Nital etchants, and the phases were identified by X-ray diffraction. Hardness profiles and hardness measured on surface steel were determined using Vickers hardness and nanoindentation tester, respectively. It was verified that nitrided layer produced in CA-6NM martensitc stainless steel is constituted of compound layer, being that formation of the diffusion zone was not observed for the studied conditions. The higher the nitrogen amounts in gas mixture the higher is the thickness of the nitrided layer and the probability to form different nitride phases, in the case γ'-Fe4N, ε-Fe2-3N and CrN phases. Intrinsic hardness of the nitrided layers produced in the CA-6NM stainless steel is about 12-14 GPa (~1200-1400 HV.

  19. Tribocorrosion studies of metallic biomaterials: The effect of plasma nitriding and DLC surface modifications.

    Science.gov (United States)

    Zhao, Guo-Hua; Aune, Ragnhild E; Espallargas, Nuria

    2016-10-01

    The medical grade pure titanium, stainless steel and CoCrMo alloy have been utilized as biomaterials for load-bearing orthopedic prosthesis. The conventional surgery metals suffer from a combined effect of wear and corrosion once they are implanted, which may significantly accelerate the material degradation process. In this work, the tribocorrosion performance of the metallic biomaterials with different surface modifications was studied in the simulated body fluid for the purpose of investigating the effect of the surface treatments on the tribocorrosion performance and eventually finding the most suitable implantation materials. The metals were subjected to surface modifications by plasma nitriding in different treatment temperatures or physical vapor deposition (PVD) to produce diamond-like carbon (DLC) coating, respectively. The dry wear and tribocorrosion properties of the samples were evaluated by using a reciprocating ball-on-disc tribometer equipped with an electrochemical cell. Prior to the tribocorrosion tests, their electrochemical behavior was measured by the potentiodynamic polarization in phosphate buffer saline (PBS) solution at room temperature. Both stainless steel and CoCrMo after low temperature nitriding kept their passive nature by forming an expanded austenite phase. The DLC coated samples presented the low anodic corrosion current due to the chemical inertness of the carbon layer. During the tribocorrosion tests at open circuit potential, the untreated and low temperature nitrided samples exhibited significant potential drop towards the cathodic direction, which was a result of the worn out of the passive film. Galvanic coupling was established between the depassivated (worn) area and the still passive (unworn) area, making the materials suffered from wear-accelerated corrosion. The DLC coating performed as a solid lubricant in both dry wear and tribocorrosion tests, and the resulting wear after the tests was almost negligible. Copyright

  20. Effect of the diameter and depth of pinholes on surface characteristics in the DC pulse plasma nitriding process

    International Nuclear Information System (INIS)

    Calahonra, M.C.G; Egidi, D.A; Svoboda, H; Corengia, P

    2006-01-01

    The ion nitriding treatment is a process widely used in steel alloys to improve the material's properties; such as surface hardness, resistance to wear, fatigue life and resistance to corrosion. But geometric changes in the components can produce during the nitriding process different effects on the behavior of the plasma, such as local variations in the electric field, an empty cathode effect, etc. These in turn can affect among other factors the local temperature and therefore the kinetics of the process, generating variations in the compound layer thicknesses and zone of diffusion, and micro-hardness profile. These heterogeneities limit the effectiveness of the plasma nitriding process, where control and duplication of the surface modification are most important. This work aims to study the effect of the geometry of the pieces treated with ionic nitriding, especially the effect of the orifices. An understanding of the operating mechanisms is sought in order to predict the development of the compound layer and zone of diffusion inside the pinholes. A series of orifices with different diameters and depths were machine made in AISI 4140 quenched and tempered cylindrical steel test pieces. The diameters analyzed were 2, 4, 6, 10 and 12 mm, while the depths studied were 3, 8 and 15 mm, resulting in 15 different configurations. The samples were nitrided by DC-pulse plasma in an industrial reactor, using a mixture of 75% H 2 - 25% N 2 , during 15 hours at a temperature of 500 o C. The nitrided test pieces were characterized with transverse sections using optic and scanning electron microscopy and Vickers micro-hardness profiles, measuring the thicknesses of white layer and zone of diffusion on the wall and base of the orifices. The results show that the sizes of the pinholes made in AISI 4140 steel greatly influence the uniformity and continuity of the compound layers and zones of diffusion. 'Critical diameters' for pinholes were also defined, underneath which the

  1. Plasma wave excitation by intense microwave transmission from a space vehicle

    Science.gov (United States)

    Kimura, I.; Matsumoto, H.; Kaya, N.; Miyatake, S.

    An impact of intense microwave upon the ionospheric plasma was empirically investigated by an active rocket experiment (MINIX). The rocket carried two high-power (830W) transmitters of 2.45 GHz microwave on the mother section of the rocket. The ionospheric plasma response to the intense microwave was measured by a diagnostic package installed on both mother and daughter sections. The daughter section was separated from the mother with a slow speed of 15 cm/sec. The plasma wave analyzers revealed that various plasma waves are nonlinearly excited by the microwave. Among them, the most intense are electron cyclotron waves, followed by electron plasma waves. Extremely low frequency waves (several tens of Hz) are also found. The results of the data analysis as well as comparative computer simulations are given in this paper.

  2. Tribological Properties of Surface-Textured and Plasma-Nitrided Pure Titanium Under Oil Lubrication Condition

    Science.gov (United States)

    Zhang, Baosen; Dong, Qiangsheng; Ba, Zhixin; Wang, Zhangzhong; Shi, Hancheng; Xue, Yanting

    2018-01-01

    Plasma nitriding was conducted as post-treatment for surface texture on pure titanium to obtain a continuous nitriding layer. Supersonic fine particles bombarding (SFPB) was carried out to prepare surface texture. The surface morphologies and chemical composition were analyzed using scanning electron microscope and energy disperse spectroscopy. The microstructures of modified layers were characterized by transmission electron microscope. The tribological properties of surface-textured and duplex-treated pure titanium under oil lubrication condition were systematically investigated in the ball-on-plate reciprocating mode. The effects of applied load and sliding velocity on the tribological behavior were analyzed. The results show that after duplex treatments, the grains size in modified layer becomes slightly larger, and hardness is obviously improved. Wear resistance of duplex-treated pure titanium is significantly improved referenced to untreated and surface-textured pure titanium, which is 3.22 times as much as untreated pure titanium and 2.15 times of that for surface-textured pure titanium, respectively.

  3. Grazing incidence synchrotron X-ray diffraction and Moessbauer spectroscopy analyses of plasma nitrided ASTM F138 stainless steel

    Energy Technology Data Exchange (ETDEWEB)

    Souza, Danilo Olzon Dionysio de; Ardisson, Jose Domingos, E-mail: dolzon@gmail.com [Centro de Desenvolvimento da Tecnologia Nuclear (CDTN/CNEN-MG), Belo Horizonte, MG (Brazil); Silva, Edilaine Honorio [Studiecentrum voor Kernenergie (Belgium); Olzon-Dionysio, Maristela; Souza, Sylvio Dionysio de; Fabris, Jose Domingos [Universidade Federal dos Vales do Jequitinhonha e Mucuri (UFVJM), Diamantina, MG (Brazil); Martinez, L.G. [Instituto de Pesquisas Energeticas e Nucleares (IPEN/CNEN-SP), Sao Paulo, SP (Brazil)

    2016-07-01

    Full text: systematic investigation of samples of plasma-nitriding austenitic stainless steels ASTM F138 and AISI 316L is reported. The surface treatment of the steels through plasma-nitriding was used to improve further the hardness, wear and corrosion resistance of these stainless steels. The resulting layered crystallographic structure actually corresponds to several phases with close cell parameters, making their identification and quantification a real experimental challenge. The ASTM F138 and AISI 316L stainless steel disks were plasma nitrided for 4 h at 400 deg C in a 80% H{sub 2} -20% N2 atmosphere at 6 torr, using plasma current frequencies between 6 and 100 kHz. Data of Moessbauer (CEMS and CXMS) and grazing incidence synchrotron X-ray diffraction (XRD-SR) were systematically collected. The nitrided layer thickness were not in general influenced by the plasma frequency, except at 12 kHz, which produced a layer thickness of approximately 8.0 mm, being in average 40% thicker than for the other samples. CXMS and CEMS Moessbauer spectra for this 12 kHz-sample show a much more pronounced magnetic resonance lines than for the other samples. The Fe{sub 4}N phase presents a single magnetic hyperfine interaction; the other two (Fe{sub 2-3}N and the expanded austenite) present both paramagnetic and magnetic components, even though their hyperfine parameters may not be safely separated. We also present the results of XRD-SR that were probed at several depths. The data from these techniques may be consistently correlated and this leads to an improved model to explain the structure of the nitrided layers. (author)

  4. System to continuously produce carbon fiber via microwave assisted plasma processing

    Science.gov (United States)

    White, Terry L; Paulauskas, Felix L; Bigelow, Timothy S

    2014-03-25

    A method for continuously processing carbon fiber including establishing a microwave plasma in a selected atmosphere contained in an elongated chamber having a microwave power gradient along its length defined by a lower microwave power at one end and a higher microwave power at the opposite end of the elongated chamber. The elongated chamber having an opening in each of the ends of the chamber that are adapted to allow the passage of the fiber tow while limiting incidental gas flow into or out of said chamber. A continuous fiber tow is introduced into the end of the chamber having the lower microwave power. The fiber tow is withdrawn from the opposite end of the chamber having the higher microwave power. The fiber to is subjected to progressively higher microwave energy as the fiber is being traversed through the elongated chamber.

  5. Plasma heating and confinement in toroidal magnetic bottle by means of microwave slowing-down structure

    International Nuclear Information System (INIS)

    Datlov, J.; Klima, R.; Kopecky, V.; Musil, J.; Zacek, F.

    1977-01-01

    An invention is described concerning high-frequency plasma heating and confinement in toroidal magnetic vessels. Microwave energy is applied to the plasma via one or more slowing-down structures exciting low phase velocity waves whose energy may be efficiently absorbed by plasma electrons. The wave momentum transfer results in a toroidal electrical current whose magnetic field together with an external magnetic field ensure plasma confinement. The low-frequency modulation of microwave energy may also be used for heating the ion plasma component. (J.U.)

  6. Superconducting structure with layers of niobium nitride and aluminum nitride

    International Nuclear Information System (INIS)

    Murduck, J.M.; Lepetre, Y.J.; Schuller, I.K.; Ketterson, J.B.

    1989-01-01

    A superconducting structure is formed by depositing alternate layers of aluminum nitride and niobium nitride on a substrate. Deposition methods include dc magnetron reactive sputtering, rf magnetron reactive sputtering, thin-film diffusion, chemical vapor deposition, and ion-beam deposition. Structures have been built with layers of niobium nitride and aluminum nitride having thicknesses in a range of 20 to 350 Angstroms. Best results have been achieved with films of niobium nitride deposited to a thickness of approximately 70 Angstroms and aluminum nitride deposited to a thickness of approximately 20 Angstroms. Such films of niobium nitride separated by a single layer of aluminum nitride are useful in forming Josephson junctions. Structures of 30 or more alternating layers of niobium nitride and aluminum nitride are useful when deposited on fixed substrates or flexible strips to form bulk superconductors for carrying electric current. They are also adaptable as voltage-controlled microwave energy sources. 8 figs

  7. Hybrid processing of Ti-6Al-4V using plasma immersion ion implantation combined with plasma nitriding

    Directory of Open Access Journals (Sweden)

    Silva Maria Margareth da

    2006-01-01

    Full Text Available Based on the fact that the Ti-6Al-4V alloy has good mechanical properties, excellent resistance to corrosion and also excellent biocompatibility, however with low wear resistance, this work aims to test plasma processes or combination of plasma and ion implantation processes to improve these characteristics. Two types of processing were used: two steps PIII (Plasma Immersion Ion Implantation combined with PN (Plasma Nitriding and single step PIII treatment. According to Auger Electron Spectroscopy (AES results, the best solution was obtained by PIII for 150 minutes resulting in ~ 65 nm of nitrogen implanted layer, while the sample treated with PIII (75 minutes and PN (75 minutes reached ~ 35 nm implanted layer. The improvement of surface properties could also be confirmed by the nanoindentation technique, with values of hardness increasing for both processes. AFM (Atomic Force Microscopy characterization showed that the single step PIII process presented greater efficiency than the duplex process (PIII + PN, probably due to the sputtering occurring during the second step (PN removing partially the implanted layer of first step (PIII.

  8. Nitridation effects of Si(1 1 1) substrate surface on InN nanorods grown by plasma-assisted molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Feng, Shan [Faculty of Materials Science and Chemistry, China University of Geosciences, Wuhan 430074 (China); Tan, Jin, E-mail: jintan_cug@163.com [Faculty of Materials Science and Chemistry, China University of Geosciences, Wuhan 430074 (China); Engineering Research Center of Nano-Geomaterials of Ministry of Education, China University of Geosciences, Wuhan 430074 (China); Li, Bin; Song, Hao; Wu, Zhengbo; Chen, Xin [Faculty of Materials Science and Chemistry, China University of Geosciences, Wuhan 430074 (China)

    2015-02-05

    Graphical abstract: The morphology evolution of InN nanorods in samples (g)–(i). The alignment of InN nanorods is improved and the deviation angle distribution narrows down with increase in nitriding time. It suggests that extending the nitriding time can enhance the vertical orientation of InN nanorods. - Highlights: • InN nanorods were grown on surface nitrided Si(1 1 1) substrate using PAMBE system. • Nitridation of substrate surface has a strong effect on morphology of InN nanorods. • InN nanorods cannot be formed with 1 min nitridation of Si(1 1 1) substrate. • Increasing nitriding time will increase optimum growth temperature of InN nanorods. • Increasing nitriding time can enhance vertical orientation of InN nanorods. - Abstract: The InN nanorods were grown on Si(1 1 1) substrate by plasma-assisted molecular beam epitaxy (PAMBE) system, with a substrate nitridation process. The effect of nitriding time of Si(1 1 1) substrate on morphology, orientation and growth temperature of InN nanorods was characterized via scanning electron microscopy (SEM) and X-ray diffraction (XRD). The deviation angle of InN nanorods was measured to evaluate the alignment of arrays. The results showed that InN nanorods could not be formed with 1 min nitridation of Si(1 1 1) substrate, but they could be obtained again when the nitriding time was increased to more than 10 min. In order to get aligned InN nanorods, the growth temperature needed to increase with longer nitriding time. The vertical orientation of InN nanorods could be enhanced with increase in nitriding time. The influence of the substrate nitridation on the photoluminescence (PL) spectra of InN nanorods has been investigated.

  9. Analysis of mechanical properties of steel 1045 plasma nitriding: with and without tempering

    International Nuclear Information System (INIS)

    Machado, N.T.B.; Passos, M.L.M. dos; Riani, J.C.; Recco, A.A.C.

    2014-01-01

    The purpose of this study was to evaluate the possibility of tempering during the nitriding of AISI 1045 steel. The objective was to evaluate the possibility of eliminating this phase, with the nitriding properties remaining unaltered. For this, three parameter samples were compared: quenched, tempered and nitrided for 2h; quenching and nitrided for 2h and quenching and nitrided for 4h. The analysis techniques used for characterizing the samples before and after nitriding were optical microscopy, hardness Rockwell C (HRC), scanning electron microscopy (SEM), X-ray diffraction (XRD). Results showed that phase γ is the most favorable of all parameters tested. The hardness assays showed that samples with different initial hardness (with and without tempering) and even nitriding time showed similar mechanical properties. This fact suggests that the tempering process occurred parallel to the nitriding process. (author)

  10. Spectroscopic study of microwave induced plasmas : exploration of active and passive methods

    NARCIS (Netherlands)

    Vries, de N.

    2008-01-01

    Microwave induced plasmas (MIPs) are used for a number of high-tech applications like material processing, light generation, gas cleaning and spectrochemical analysis. Especially the feature that MIPs can be operated remotely and that the propagation of the microwaves can be manipulated with slits,

  11. Crystalline and amorphous phases in carbon nitride films produced by intense high-pressure plasma

    International Nuclear Information System (INIS)

    Gurarie, V.N.; Orlov, A.V.; Bursill, L.A.; JuLin, P.; Nugent, K.W.; Chon, J.W.; Prawer, S.

    1997-01-01

    Carbon-nitride films are prepared using a high-intensity pulsed plasma deposition technique. A wide range of nitrogen pressure and discharge intensity are used to investigate their effect on the morphology, nitrogen content, structure, bonding, phase composition and mechanical characteristics of the CN films deposited. Increasing the nitrogen pressure from 0.1 atm to 10 atm results in an increase of nitrogen incorporation into CN films to maximum of 45 at %. Under the high-energy density deposition conditions which involve ablation of the quartz substrate the CN films are found to incorporate in excess of 60 at %N. Raman spectra of these films contain sharp peaks characteristic of a distinct crystalline CN phase. TEM diffraction patterns for the films deposited below 1 atm unambiguously show the presence of micron-sized crystals displaying a cubic symmetry. (authors)

  12. Microwave reflectrometry for electron density measurements in the TJ-1 tokamak plasma

    International Nuclear Information System (INIS)

    Anabitarte, E.; Bustamante, E.G.; Calderon, M.A.G.; Vegas, A.

    1986-01-01

    A study about microwave reflectometry to measure the outside profile of the electron plasma density on tokamak TJ-1 is presented. It is also presented the condition of applicability of this method after the characteristic parameters of the plasma and its resolution. The simulation of the plasma in laboratory by means of a metallic mirror causes the whole characterization of the reflectometer. (author)

  13. Spectroscopic diagnostics and modelling of silane microwave plasmas

    International Nuclear Information System (INIS)

    Fantz, U.

    1998-01-01

    Low-pressure silane plasmas (2-20 Pa) diluted with the noble gases helium and argon as well as hydrogen were generated by microwave excitation in order to determine plasma parameters and absolute particle number densities. Specific silane radicals (SiH, Si, H 2 , H) were measured by means of optical emission spectroscopy, whereas particle densities of silane, disilane and molecular hydrogen were measured with mass spectroscopy. Experimental results confirm model calculations, which were carried out to determine number densities of all silane radicals and of higher silanes as well as electron temperature. The electron temperature varies from 1.5 to 4 eV depending on pressure and gas mixture. The temperature of heavy particles is 450 K and the electron number density is 9x10 16 m -3 . The rotational temperatures of SiH are between room temperature and 2000 K due to increasing dissociative excitation. In the plasma the number density of silane is reduced, whereas the number density of molecular hydrogen is close to the silane density, which is fed in. Particle densities of SiH 3 , disilane and atomic hydrogen are in the range of a few per cent of the silane number density. At low pressure the SiH 2 density is similar to SiH 3 and decreases with increasing pressure due to heavy particle collisions with silane producing higher silanes. Particle densities of SiH and Si are only in the range of some 10 -3 of the silane density decreasing with increasing collisions of heavy particles with silane and molecular hydrogen. In mixtures with argon Penning reactions increase the silane dissociation. (author)

  14. Plasma-nitride α-βTi alloy: layer characterization and mechanical properties modification

    International Nuclear Information System (INIS)

    Raveh, A.; Bussiba, A.; Bettelheim, A.; Katz, Y.

    1993-01-01

    Beyond continuous efforts to develop advanced processing methods or new directions in surface modification, the foundations for assessment of appropriate surface layers still remain very challenging. In this context, Ti-6Al-4V α-β alloy was investigated mainly after plasma nitriding by nitrogen or by a nitrogen mixture with hydrogen and/or argon. The current study objectives consist in gradually developing some aspects of the microstructure and property relationship. As such, the study centred on the characterization of refined layers as well as confronting critical questions of how layers and interfacial microstructure might affect the near-surface mechanical properties (i.e. microhardness, fatigue resistance and erosion). In particular, the effects on fatigue behaviour are emphasized by utilizing single edge notched specimens and fatigue stepdown techniques. It is found that two distinct sublayers, comprising δ-TiN and δ-TiN + ε-Ti 2 N phases, were formed with alloying elements in a segregated zone, followed by a solid solution of N in the Ti. Here, the far field affected zone extended up to about 20 μm. It was observed that the formation of the uppermost sublayer (δ-TiN phase) with a composition including H, NH, and N, as well as Ti depleted of Al and V, has a strong effect on the layer properties. A microhardness value as high as 29.4 GPa (3000 kgf mm -2 ) was obtained with significant improvements in the erosion resistance and fatigue life. It was found that in some controlled plasma nitriding conditions the fatigue life for crack initiation increased by more than a factor of 3. Accordingly, the cyclic crack initiation behaviour is described, revealing substantial influences due to crack tip field perturbations, or fracture resistance modifications. Finally, the role of extrinsic crack tip shielding effects as related to closure or to the local effective driving force for microcracking onset is elaborated. (orig.)

  15. Plasma nitriding and simultaneous tempering of VF 800AT tool steel; Nitretacao por plasma com revenimento simultaneo do aco ferramenta VF 800AT

    Energy Technology Data Exchange (ETDEWEB)

    Prass, Andre Ricardo; Fontana, Luis Cesar; Recco, Abel Andre Candido, E-mail: prass.andrericardo@gmail.com, E-mail: luis.fontana@udesc.br, E-mail: abel.recco@udesc.br [Universidade do Estado de Santa Catarina (UDESC), Joinville, SC (Brazil)

    2017-04-15

    Plasma nitriding of tool steels improves the surface hardness due to formation of diffusion zone and/or compound layer. The process parameters such as temperature, gas composition and dwell time, allow to control the layer thickness, the microstructure, the crystalline phases and the type of layer (for example white layer or diffusion zone). This paper discusses an alternative procedure for the heat treatment of tempering and surface treatment, both in plasma or combining conventional heat treatment with subsequent plasma nitriding. Carrying out both treatments in plasma could enable reduction in manufacturing costs, lower energy consumption and less time for tools manufacturing. Samples of VF800AT steel were treated and characterized (at surface and core of samples) through the following technique: X-ray diffraction, optical microscopy, scanning electron microscopy, micro-hardness profile and Rockwell C measurement. Temperature measurements during the plasma treatment, show that arise thermal gradient between the surface and the core of the samples. In this work, it was observed that the surface was up to 7% hotter than the core of sample, during the plasma treatment with temperature of magnitude about 5 x 10{sup 2} °C. This thermal gradient seems inherent to the plasma process, so that it can produce different microstructure, hardness and crystalline phases between core and edge of samples. However, when two tempering operations are prior carried out in a muffle furnace and the third tempering treatment is subsequently carried out simultaneously with the plasma nitriding, it is observed that the microstructure, the crystalline phases, hardness and micro hardness (in both, edge and core) are similar to treatments done in conventional mode cycle (in muffle furnace) with subsequent plasma nitriding. (author)

  16. Improvement of a microwave ECR plasma source for the plasma immersion ion implantation and deposition process

    International Nuclear Information System (INIS)

    Wu Hongchen; Zhang Huafang; Peng Liping; Jiang Yanli; Ma Guojia

    2004-01-01

    The Plasma Immersion Ion Implantation and Deposition (PIII and D) process has many advantages over the pure plasma immersion ion implantation or deposition. It can compensate for or eliminate the disadvantages of the shallow modification layer (for PIII) and increase the bond strength of the coating (of deposition). For this purpose, a new type of microwave plasma source used in the PIII and D process was developed, composed of a vacuum bend wave guide and a special magnetic circuit, so that the coupling window was protected from being deposited with a coating and bombarded by high-energy particles. So the life of the window is increased. To enhance the bonding between the coating and substrate a new biasing voltage is applied to the work piece so that the implantation and deposition (or hybrid process) can be completed in one vacuum cycle

  17. Sheath and bulk expansion induced by RF bias in atmospheric pressure microwave plasma

    Science.gov (United States)

    Lee, Jimo; Nam, Woojin; Lee, Jae Koo; Yun, Gunsu

    2017-10-01

    A large axial volume expansion of microwave-driven plasma at atmospheric pressure is achieved by applying a low power radio frequency (RF) bias at an axial location well isolated from the original plasma bulk. The evolution of the plasma plume visualized by high speed ICCD imaging suggest that the free electrons drifting toward the bias electrode cause the prodigious expansion of the sheath, creating a stable plasma stream channel between the microwave and the RF electrodes. For argon plasma in ambient air, enhanced emissions of OH and N2 spectral lines are measured in the extended plume region, supporting the acceleration of electrons and subsequent generation of radical species. The coupling of RF bias with microwave provides an efficient way of enlarging the plasma volume and enhancing the production of radicals. Work supported by the National Research Foundation of Korea under BK21+ program and Grant No. 2015R1D1A1A01061556 (Ministry of Education).

  18. Microwave plasma-assisted photoluminescence enhancement in nitrogen-doped ultrananocrystalline diamond film

    Directory of Open Access Journals (Sweden)

    Yu Lin Liu

    2012-06-01

    Full Text Available Optical properties and conductivity of nitrogen-doped ultrananocrystal diamond (UNCD films were investigated following treatment with low energy microwave plasma at room temperature. The plasma also generated vacancies in UNCD films and provided heat for mobilizing the vacancies to combine with the impurities, which formed the nitrogen-vacancy defect centers. The generated color centers were distributed uniformly in the samples. The conductivity of nitrogen-doped UNCD films treated by microwave plasma was found to decrease slightly due to the reduced grain boundaries. The photoluminescence emitted by the plasma treated nitrogen-doped UNCD films was enhanced significantly compared to the untreated films.

  19. Gallium nitride based transistors for high-efficiency microwave switch-mode amplifiers

    Energy Technology Data Exchange (ETDEWEB)

    Maroldt, Stephan

    2012-07-01

    Highly-efficient switch-mode power amplifiers form key elements in future fully-digital base stations for mobile communication. This novel digital base station concept reduces system energy consumption, complexity, size and costs, while the flexibility in terms of multi-band operation and signal modulation improves. In this work, innovative core circuits for digital high-efficiency class-D and class-S power amplifiers based on gallium nitride (GaN) technology were developed for the application in digital base stations. A combination of optimized GaN devices and improvements in circuit design allow a highly-efficient switch-mode operation at mobile communication frequencies between 0.45 GHz and 2 GHz. Transistor device modeling for switch-mode operation, the simulation environment, and a broadband measurement system were established for the design and evaluation of digital switchmode power amplifiers. The design of broadband core circuits for switch-mode amplifier concepts was analyzed for dual-stage amplifier circuits, using an initial GaN technology with a gate length of 0.25 {mu}m. A speed-enhanced driver stage improved the circuit switching speed sufficiently above 1 GHz. Speed and efficiency of the amplifier core circuits were studied related to transistor parameters like cut-off frequency or gate capacitance. A reduced gate length was found to improve the switching speed, while a lower on-resistance allows the reduction of the inherent static losses of the GaN-based switches. Apart from this, the restriction of a 50 Ohm environment was found to be a major output power and switching speed limitation, due to a poor switching drive capability of the input capacitance of the GaN circuit. Finally, the optimized transistor and circuit design with an output gate width of 1.2 mm were effectively implemented in the given environment for an operation up to 2 GHz with a high drain efficiency of >65% and a digital output power of 5 W. A maximum output power of 9.7 W and a

  20. Buckyball microwave plasmas: Fragmentation and diamond-film growth

    International Nuclear Information System (INIS)

    Gruen, D.M.; Liu, Shengzhong; Krauss, A.R.; Pan, Xianzheng.

    1993-08-01

    Microwave discharges (2.45 GHz) have been generated in C 60 -containing Ar produced by flowing Ar over fullerene-containing soot. Optical spectroscopy shows that the spectrum is dominated by the d 3 Πg-a 3 Πu Swan bands of C 2 and particularly the Δv = -2, -1, 0, +1, and +2 sequences. These results give direct evidence that C 2 is one of the products of C 60 fragmentation brought about, at least in part, by collisionally induced dissociation (CID). C 60 has been used as a precursor in a plasma-enhanced chemical vapor deposition (PECVD) experiment to grow diamond-thin films. The films, grown in an Ar/H 2 gas mixture (0.14% carbon content, 100 Torr, 20 sccm Ar, 4 sccm H 2 , 1500 W, 850 degree C substrate temperature), were characterized with SEM, XRD, and Raman spectroscopy. Growth rate was found to be ∼ 0.6 μ/hr. Assuming a linear dependence on carbon concentration, a growth rate at least six times higher than commonly observed using methane as a precursor, would be predicted at a carbon content of 1% based on C 60 . Energetic and mechanistic arguments are advanced to rationalize this result based on C 2 as the growth species

  1. ZnO nanostructures induced by microwave plasma

    Directory of Open Access Journals (Sweden)

    Khaled A. Elsayed

    2015-07-01

    Full Text Available Microwave induced hydrogen plasma is used to fabricate ZnO thin films at low ambient gas pressure and controlled oxygen content in the gas mixture. The emission spectra have been observed. Optical emission spectroscopy was used to identify the chemical reaction mechanism. Structural quality of the so-obtained nanoparticles was studied by X-ray diffraction (XRD and high resolution scanning electron microscopy (SEM. SEM results showed that nanorods were formed in the process, and XRD results along with nanorod dimensions obtained from SEM are consistent with the formation of single and poly-crystalline ZnO nanorods. The alignment of these nanorods with respect to the substrates depends on the lattice mismatch between ZnO and the glass substrate. The minimum crystallite grain size as obtained from the SEM measurements was ∼24 nm and the average diameter is 70 nm with a length of 1–2 μm. The deposited ZnO thin films have a wide energy band gap that equals ∼3 eV.

  2. [Study on the Emission Spectrum of Hydrogen Production with Microwave Discharge Plasma in Ethanol Solution].

    Science.gov (United States)

    Sun, Bing; Wang, Bo; Zhu, Xiao-mei; Yan, Zhi-yu; Liu, Yong-jun; Liu, Hui

    2016-03-01

    Hydrogen is regarded as a kind of clean energy with high caloricity and non-pollution, which has been studied by many experts and scholars home and abroad. Microwave discharge plasma shows light future in the area of hydrogen production from ethanol solution, providing a new way to produce hydrogen. In order to further improve the technology and analyze the mechanism of hydrogen production with microwave discharge in liquid, emission spectrum of hydrogen production by microwave discharge plasma in ethanol solution was being studied. In this paper, plasma was generated on the top of electrode by 2.45 GHz microwave, and the spectral characteristics of hydrogen production from ethanol by microwave discharge in liquid were being studied using emission spectrometer. The results showed that a large number of H, O, OH, CH, C2 and other active particles could be produced in the process of hydrogen production from ethanol by microwave discharge in liquid. The emission spectrum intensity of OH, H, O radicals generated from ethanol is far more than that generated from pure water. Bond of O-H split by more high-energy particles from water molecule was more difficult than that from ethanol molecule, so in the process of hydrogen production by microwave discharge plasma in ethanol solution; the main source of hydrogen was the dehydrogenation and restructuring of ethanol molecules instead of water decomposition. Under the definite external pressure and temperature, the emission spectrum intensity of OH, H, O radicals increased with the increase of microwave power markedly, but the emission spectrum intensity of CH, C2 active particles had the tendency to decrease with the increase of microwave power. It indicated that the number of high energy electrons and active particles high energy electron energy increased as the increase of microwave power, so more CH, C2 active particles were split more thoroughly.

  3. Experimental investigation of gas heating and dissociation in a microwave plasma torch at atmospheric pressure

    International Nuclear Information System (INIS)

    Su, Liu; Kumar, Rajneesh; Ogungbesan, Babajide; Sassi, Mohamed

    2014-01-01

    Highlights: • Atmospheric-pressure microwave plasma torch. • Gas heating and dissociation. • Parametric studies of plasma operating conditions. • Local thermal equilibrium plasma. - Abstract: Experimental investigations are made to understand gas heating and dissociation in a microwave (MW) plasma torch at atmospheric pressure. The MW induced plasma torch operates at 2.45 GHz frequency and up to 2 kW power. Three different gas mixtures are injected in the form of axial flow and swirl flow in a quartz tube plasma torch to experimentally investigate the MW plasma to gas energy transfer. Air–argon, air–air and air–nitrogen plasmas are formed and their operational ranges are determined in terms of gas flow rates and MW power. Visual observations, optical emission spectroscopy and K-type thermocouple measurements are used to characterize the plasma. The study reveals that the plasma structure is highly dependent on the carrier gas type, gas flow rate, and MW power. However, the plasma gas temperature is shown not to vary much with these parameters. Further spectral and analytical analysis show that the plasma is in thermal equilibrium and presents very good energy coupling between the microwave power and gas heating and dissociation. The MW plasma torch outlet temperature is also measured and found to be suitable for many thermal heating and chemical dissociation applications

  4. Impact of aerosol particles on the structure of an atmospheric pressure microwave plasma afterglow

    Energy Technology Data Exchange (ETDEWEB)

    Chen Chunku [Ceramic and Composite Materials Centre, 209 Farris Engineering Centre, University of New Mexico, Albuquerque, NM (United States); Phillips, Jonathan [Los Alamos National Laboratory, MS C930, Los Alamos, NM (United States)

    2002-05-21

    Several novel ceramic processing technologies (e.g. oxide ceramic melting and spheroidization) using an atmospheric pressure microwave plasma torch were recently developed in our lab. Understanding the processes and optimization requires complete characterization of the plasma as a function of operating condition. As a first step, a non-intrusive spectroscopic method was employed to map rotational (gas), electron and excitation temperatures and electron densities of the afterglow region of microwave generated atmospheric plasmas with and without alumina particle aerosol. Two-dimensional spatially resolved mapping of rotational (gas), excitation and electron temperatures and electron densities as a function of operating conditions during material processing were developed. It was shown that the passage of an aerosol dramatically changes the structure of the afterglow. Also the non-equilibrium nature of microwave generated atmospheric argon plasma was confirmed, suggesting that only multi-temperature models are capable of modelling this region of the plasma. (author)

  5. Application of plasma silicon nitride to crystalline thin-film silicon solar cells. Paper

    Energy Technology Data Exchange (ETDEWEB)

    Schmidt, J.; Oberbeck, L.; Rinke, T.J.; Berge, C.; Bergmann, R.B.

    2002-07-01

    We use plasma-enhanced chemical vapour deposition to deposit silicon nitride (SiN{sub x}) films at low temperature(400 C) onto the front surface of two different types of crystalline thin-film Si solar cells. The silicon nitride acts as an excellent antireflection coating on Si and provides a very high degree of electronic surface passivation over a wide range of compositions, including near-stoichiometric and Si-rich SiN{sub x}. Application of stoichiometric SiN{sub x} to non-textured thin-film cells, epitaxially grown at low temperature by ion-assisted deposition onto a monocrystalline Si substrate, results in an open-circuit voltage of 622 mV, a short-circuit current density of 26.6 mA/cm{sup 2} and an efficiency of 12.7%. It is shown that the SiN{sub x}-passivated in-situ grown n{sup +}-emitter of this cell type allows to reach open-circuit voltages of up to 667 mV. Silicon-rich SiN{sub x} is applied to the phosphorus-diffused n{sup +}-emitter of a textured thin-film cell on a glass superstrate fabricated by layer-transfer. The emitter saturation current density of these cells is only 40-64 fA/cm{sup 2}, which allows for open-circuit voltages of up to 699 mV. An impressively high open-circuit voltage of 638 mV and a short-circuit current density of 32.0 mA/cm{sup 2} are obtained for a 25 {mu}m thick SiN{sub x}-passivated, random pyramid-textured transfer cell. A transfer cell efficiency of 15.3% is independently confirmed.

  6. Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films

    Energy Technology Data Exchange (ETDEWEB)

    Broas, Mikael, E-mail: mikael.broas@aalto.fi; Vuorinen, Vesa [Department of Electrical Engineering and Automation, Aalto University, P.O. Box 13500, FIN-00076 Aalto, Espoo (Finland); Sippola, Perttu; Pyymaki Perros, Alexander; Lipsanen, Harri [Department of Micro- and Nanosciences, Aalto University, P.O. Box 13500, FIN-00076 Aalto, Espoo (Finland); Sajavaara, Timo [Department of Physics, University of Jyväskylä, P.O. Box 35, FIN-40014 Jyväskylä (Finland); Paulasto-Kröckel, Mervi [Department of Electrical Engineering and Automation, Aalto University. P.O. Box 13500, FIN-00076 Aalto, Espoo (Finland)

    2016-07-15

    Plasma-enhanced atomic layer deposition was utilized to grow aluminum nitride (AlN) films on Si from trimethylaluminum and N{sub 2}:H{sub 2} plasma at 200 °C. Thermal treatments were then applied on the films which caused changes in their chemical composition and nanostructure. These changes were observed to manifest in the refractive indices and densities of the films. The AlN films were identified to contain light element impurities, namely, H, C, and excess N due to nonideal precursor reactions. Oxygen contamination was also identified in the films. Many of the embedded impurities became volatile in the elevated annealing temperatures. Most notably, high amounts of H were observed to desorb from the AlN films. Furthermore, dinitrogen triple bonds were identified with infrared spectroscopy in the films. The triple bonds broke after annealing at 1000 °C for 1 h which likely caused enhanced hydrolysis of the films. The nanostructure of the films was identified to be amorphous in the as-deposited state and to become nanocrystalline after 1 h of annealing at 1000 °C.

  7. Self-consistent evolution of plasma discharge and electromagnetic fields in a microwave pulse compressor

    International Nuclear Information System (INIS)

    Shlapakovski, A. S.; Beilin, L.; Krasik, Ya. E.; Hadas, Y.; Schamiloglu, E.

    2015-01-01

    Nanosecond-scale evolution of plasma and RF electromagnetic fields during the release of energy from a microwave pulse compressor with a plasma interference switch was investigated numerically using the code MAGIC. The plasma was simulated in the scope of the gas conductivity model in MAGIC. The compressor embodied an S-band cavity and H-plane waveguide tee with a shorted side arm filled with pressurized gas. In a simplified approach, the gas discharge was initiated by setting an external ionization rate in a layer crossing the side arm waveguide in the location of the electric field antinode. It was found that with increasing ionization rate, the microwave energy absorbed by the plasma in the first few nanoseconds increases, but the absorption for the whole duration of energy release, on the contrary, decreases. In a hybrid approach modeling laser ignition of the discharge, seed electrons were set around the electric field antinode. In this case, the plasma extends along the field forming a filament and the plasma density increases up to the level at which the electric field within the plasma decreases due to the skin effect. Then, the avalanche rate decreases but the density still rises until the microwave energy release begins and the electric field becomes insufficient to support the avalanche process. The extraction of the microwave pulse limits its own power by terminating the rise of the plasma density and filament length. For efficient extraction, a sufficiently long filament of dense plasma must have sufficient time to be formed

  8. Self-consistent evolution of plasma discharge and electromagnetic fields in a microwave pulse compressor

    Science.gov (United States)

    Shlapakovski, A. S.; Beilin, L.; Hadas, Y.; Schamiloglu, E.; Krasik, Ya. E.

    2015-07-01

    Nanosecond-scale evolution of plasma and RF electromagnetic fields during the release of energy from a microwave pulse compressor with a plasma interference switch was investigated numerically using the code MAGIC. The plasma was simulated in the scope of the gas conductivity model in MAGIC. The compressor embodied an S-band cavity and H-plane waveguide tee with a shorted side arm filled with pressurized gas. In a simplified approach, the gas discharge was initiated by setting an external ionization rate in a layer crossing the side arm waveguide in the location of the electric field antinode. It was found that with increasing ionization rate, the microwave energy absorbed by the plasma in the first few nanoseconds increases, but the absorption for the whole duration of energy release, on the contrary, decreases. In a hybrid approach modeling laser ignition of the discharge, seed electrons were set around the electric field antinode. In this case, the plasma extends along the field forming a filament and the plasma density increases up to the level at which the electric field within the plasma decreases due to the skin effect. Then, the avalanche rate decreases but the density still rises until the microwave energy release begins and the electric field becomes insufficient to support the avalanche process. The extraction of the microwave pulse limits its own power by terminating the rise of the plasma density and filament length. For efficient extraction, a sufficiently long filament of dense plasma must have sufficient time to be formed.

  9. A microwave interferometer for density measurement and stabilization in process plasmas

    International Nuclear Information System (INIS)

    Pearson, D.I.C.; Campbell, G.A.; Domier, C.W.

    1988-01-01

    A low-cost heterodyne microwave interferometer system capable of measuring and/or controlling the plasma density over a dynamic range covering two orders of magnitude is demonstrated. The microwave frequency is chosen to match the size and density of plasma to be monitored. Large amplitude, high frequency fluctuations can be quantitatively followed and the longer-time-scale density can be held constant over hours of operation, for example during an inline production process to maintain uniformity and stoichiometry of films. A linear relationship is shown between plasma density and discharge current in a specific plasma device. This simple relationship makes control of the plasma straightforward using the interferometer as a density monitor. Other plasma processes could equally well benefit from such density control capability. By combining the interferometer measurement with diagnostics such as probes or optical spectroscopy, the total density profile and the constituent proportions of the various species in the plasma could be determined

  10. Surface Modification of C17200 Copper-Beryllium Alloy by Plasma Nitriding of Cu-Ti Gradient Film

    Science.gov (United States)

    Zhu, Y. D.; Yan, M. F.; Zhang, Y. X.; Zhang, C. S.

    2018-03-01

    In the present work, a copper-titanium film of gradient composition was firstly fabricated by the dual magnetron sputtering through power control and plasma nitriding of the film was then conducted to modify C17200 Cu alloy. The results showed that the prepared gradient Cu-Ti film by magnetron sputtering was amorphous. After plasma nitriding at 650 °C, crystalline Cu-Ti intermetallics appeared in the multi-phase coating, including CuTi2, Cu3Ti, Cu3Ti2 and CuTi. Moreover, even though the plasma nitriding duration of the gradient Cu-Ti film was only 0.5 h, the mechanical properties of the modified Cu surface were obviously improved, with the surface hardness enhanced to be 417 HV0.01, the wear rate to be 0.32 × 10-14 m3/Nm and the friction coefficient to be 0.075 at the load of 10 N, which are all more excellent than the C17200 Cu alloy. In addition, the wear mechanism also changed from adhesion wear for C17200 Cu substrate to abrasive wear for the modified surface.

  11. A study of the ion-molecule reaction in a microwave plasma of propylene

    International Nuclear Information System (INIS)

    Carmi, U.

    1980-07-01

    Microwave plasma of propylene and of argon-propylene mixture were sampled by a quadrupole mass-spectrometer. The composition of the plasma was investigated as a function of external parameters such as pressure, initial concentration of gases, microwave power and sampling position. Three main paths were determined for the pyrolysis and polymerization of propylene, that constitute the rate determining step. Rate constants were determined for the various reactions between propylene and the intermediates. An overall rate constant for the disappearance of propylene was determined. This constant was found to be dependent on the initial gas concentration and on plasma pressure

  12. Experimental and numerical investigations of microwave return loss of aircraft inlets with low-pressure plasma

    Science.gov (United States)

    Zhang, Yachun; He, Xiang; Chen, Jianping; Chen, Hongqing; Chen, Li; Zhang, Hongchao; Ni, Xiaowu; Lu, Jian; Shen, Zhonghua

    2018-03-01

    The relationships between return losses of the cylindrical inlet and plasma discharge parameters are investigated experimentally and numerically. The return losses are measured using a high dynamic range measurement system and simulated by COMSOL Multiphysics when the frequency band of the microwaves is in the range 1-4 GHz. The profiles of the plasma density are estimated using Epstein and Bessel functions. Results show that the incident microwaves can be absorbed by plasma efficaciously. The maximal return loss can reach -13.84 dB when the microwave frequency is 2.3 GHz. The increase of applied power implies augmentation of the return loss, which behaves conversely for gas pressure. The experimental and numerical results display reasonable agreement on return loss, suggesting that the use of plasma is effective in the radar cross section reduction of aircraft inlets.

  13. Control of plasma profile in microwave discharges via inverse-problem approach

    Directory of Open Access Journals (Sweden)

    Yasuyoshi Yasaka

    2013-12-01

    Full Text Available In the manufacturing process of semiconductors, plasma processing is an essential technology, and the plasma used in the process is required to be of high density, low temperature, large diameter, and high uniformity. This research focuses on the microwave-excited plasma that meets these needs, and the research target is a spatial profile control. Two novel techniques are introduced to control the uniformity; one is a segmented slot antenna that can change radial distribution of the radiated field during operation, and the other is a hyper simulator that can predict microwave power distribution necessary for a desired radial density profile. The control system including these techniques provides a method of controlling radial profiles of the microwave plasma via inverse-problem approach, and is investigated numerically and experimentally.

  14. Electrical Characteristics of Carbon Nanotubes by Plasma and Microwave Surface Treatments

    International Nuclear Information System (INIS)

    Cho, Sangjin; Lee, Soonbo; Boo, Jinhyo; Shrestha, Shankar Prasad

    2014-01-01

    The plasma and microwave surface treatments of carbon nanotubes that loaded on plastic substrates were carried out with expecting a change of carbon nanotube dispersion by increasing treatment time. The microwave treatment process was undergone by commercial microwave oven (800 W). The electrical property was measured by hall measurement and resistance was increased by increasing O 2 flow rate of plasma, suggesting an improvement of carbon nanotube dispersion and a possibility of controlling the resistances of carbon nanotubes by plasma surface treatment. The resistance was increased in both polyethylene terephthalate and polyimide substrates by increasing O 2 flow rate. Resistance changes only slightly with different O 2 flow treatment in measure rho for all polyimide samples. Sheet resistance is lowest in polyimide substrate not due to high carbon nanotube loading but due to tendency to remain in elongated structure. O 2 or N 2 plasma treatments on both polyethylene terephthalate and polyimide substrates lead to increase in sheet resistance

  15. Experimental studies of microwave interaction with a plasma-covered planar conducting surface

    International Nuclear Information System (INIS)

    Destler, W.W.; Rodgers, J.; DeGrange, J.E.; Segalov, Z.

    1990-01-01

    The authors present experimental studies of the reflection and absorption of microwave radiation from a plasma-covered planar conducting surface. In the experiments, microwave radiation from both highpower, short pulse (10 GHz, 100 MW, 30 ns) and low power (10 GHz, 10 mW, CW) sources is radiated at a 30 cm diameter conducting plate. A time-varying plasma is created on the surface of the conductor by 19 coaxial plasma guns embedded in the surface of the plate and discharged using a fast-rise capacitor bank. The plasma density distribution on the conducting surface is a function of time and the charging voltage on the capacitor bank. Incident and reflected microwave radiation has been measured for a wide variety of experimental conditions

  16. Enhancement of corrosion resistance for plasma nitrided AISI 4140 steel by plain air plasma post-oxidizing

    Energy Technology Data Exchange (ETDEWEB)

    Wu, Jiqiang; Liu, Han; Ye, Xuemei [Jiangsu Key Laboratory of Materials Surface Technology, Changzhou University, Changzhou 213164 (China); Chai, Yating [Materials Research and Education Center, Auburn University, AL 36849 (United States); Hu, Jing, E-mail: jinghoo@126.com [Jiangsu Key Laboratory of Materials Surface Technology, Changzhou University, Changzhou 213164 (China); Materials Research and Education Center, Auburn University, AL 36849 (United States)

    2015-05-25

    Highlights: • Plain air was primarily used for plasma post-oxidation for AISI 4140 steel. • A thin iron oxide layer composed of Fe{sub 3}O{sub 4} to Fe{sub 2}O{sub 3} was formed on top of the compound layer. • The ratio of Fe{sub 3}O{sub 4} to Fe{sub 2}O{sub 3} was closely related to the post-oxidizing conditions. • Post-oxidizing at 673 K for 60 min brought out highest ratio of Fe{sub 3}O{sub 4} to Fe{sub 2}O{sub 3} and optimum corrosion resistance. - Abstract: Plasma post-oxidizing was conducted immediately after plasma nitriding in the same equipment for AISI 4140 steel, and plain air was used as the oxygen bearing gas. The cross-sectional microstructures of the treated samples were observed by optical metallography and scanning electron microcopy (SEM), and the thickness of compound layer was measured accordingly. The phases were determined by X-ray diffraction (XRD), corrosion resistance was evaluated by electrochemical polarization, and the surface morphology before and after polarization test was also observed by SEM. Meanwhile, standard Gibbs free energy of the oxidation reactions existed in Fe–O system was calculated. The results show that a thin iron oxide layer composed of magnetite (Fe{sub 3}O{sub 4}) and hematite (Fe{sub 2}O{sub 3}) is formed on top of the compound layer during plasma post-oxidizing process, and the ratio of magnetite (Fe{sub 3}O{sub 4}) to hematite (Fe{sub 2}O{sub 3}) is depended on plasma post-oxidizing temperature and time. Highest ratio of Fe{sub 3}O{sub 4} to Fe{sub 2}O{sub 3} is obtained while post-oxidizing at 673 K for 60 min due to lower standard Gibbs free energy and appropriate forming rate for the formation of Fe{sub 3}O{sub 4} at this temperature. The thin oxide layer brings out significant enhancement of corrosion resistance, especially at higher ratios of Fe{sub 3}O{sub 4} to Fe{sub 2}O{sub 3}, due to the dense and adherent characteristic of Fe{sub 3}O{sub 4} oxide. Surface images of the post-oxidizing specimen

  17. Mechanical and tribological properties of AISI 304 stainless steel nitrided by glow discharge compared to ion implantation and plasma immersion ion implantation

    International Nuclear Information System (INIS)

    Foerster, C.E.; Serbena, F.C.; Silva, S.L.R. da; Lepienski, C.M.; Siqueira, C.J. de M.; Ueda, M.

    2007-01-01

    Results about mechanical and tribological behavior of AISI 304 stainless steel nitrided by three different ion beam processes - glow discharge (GD), ion implantation (II) and plasma immersion ion implantation (PI3) are reported. Expanded austenite γ N and nitrides phases (Fe 2+x N, γ'-Fe 4 N and Cr-N) were identified as a function of nitriding conditions. Hardness (H) and elastic modulus (E) profiles were obtained by instrumented penetration. The hardness reached values as high as 21 GPa by PI3. Tribological behavior was studied by reciprocating sliding tests with a WC (Co) ball at room temperature (RT) in dry condition. Different wear regimes were identified in the friction coefficient profiles. The profile form and the running-in distance are strongly dependent on the nitriding process. Adhesive and abrasive wear components can be inferred from these friction profiles. Hardness and tribological performance, after the nitriding processes, are discussed in terms of surface microstructure

  18. Visualization of the microwave beam generated by a plasma relativistic microwave amplifier

    Energy Technology Data Exchange (ETDEWEB)

    Alekseev, I. S.; Ivanov, I. E.; Strelkov, P. S., E-mail: strelkov@fpl.gpi.ru [Russian Academy of Science, Prokhorov General Physics Institute (Russian Federation); Tarakanov, V. P., E-mail: karat@msk.su [Russian Academy of Sciences, Joint Institute for High Temperatures (Russian Federation); Ulyanov, D. K. [Russian Academy of Science, Prokhorov General Physics Institute (Russian Federation)

    2017-03-15

    A method based on the detection of emission of a dielectric screen with metal microinclusions in open air is applied to visualize the transverse structure of a high-power microwave beam. In contrast to other visualization techniques, the results obtained in this work provide qualitative information not only on the electric field strength, but also on the structure of electric field lines in the microwave beam cross section. The interpretation of the results obtained with this method is confirmed by numerical simulations of the structure of electric field lines in the microwave beam cross section by means of the CARAT code.

  19. Measurement of electric field distribution along the plasma column in Microwave jet discharges at atmospheric pressure

    International Nuclear Information System (INIS)

    Razzak, M. Abdur; Takamura, Shuichi; Tsujikawa, Takayuki; Shibata, Hideto; Hatakeyama, Yuto

    2009-01-01

    A new technique for the direct measurement of electric field distribution along the plasma column in microwave jet discharges is developed and employed. The technique is based on a servomotor-controlled reciprocating antenna moving along the nozzle axis and plasma column. The measurement technique is applied to a rectangular waveguide-based 2.45 GHz argon and helium plasma jets generated by using the modified TIAGO nozzle at atmospheric pressure with a microwave power of less than 500 W. The measurement has been done with and without igniting the plasma jet in order to investigate the standing wave propagation along the nozzle axis and plasma column. It is observed that the electric field decay occurs slowly in space with plasma ignition than that of without plasma, which indicates the surface electromagnetic wave propagation along the plasma column in order to sustain the plasma jet. This study enables one to design, determine and optimize the size and structure of launcher nozzle, which plays an important role for the stable and efficient microwave plasma generators. (author)

  20. Ground penetrating radar using a microwave radiated from laser-induced plasma

    Energy Technology Data Exchange (ETDEWEB)

    Nakajima, H; Tanaka, K A [Graduate School of Engineering and Institute of Laser Engineering, Suita, Osaka University (Japan); Yamaura, M; Shimada, Y; Fujita, M [Institute for Laser Technology, Suita, Osaka (Japan)], E-mail: nakajima-h@ile.osaka-u.ac.jp

    2008-05-01

    A plasma column radiates a microwave to surroundings when generated with laser irradiation. Using such a microwave, we are able to survey underground objects and architectures from a remote place. In this paper, the microwave radiated from a plasma column induced by an intense laser ({approx} 10{sup 9} W/cm{sup 2}) were measured. Additionally, a proof test of this method was performed by searching an underground aluminum disk (26 cm in diameter, 1 cm in depth, and 1 m apart from a receiving antenna). As the result, the characteristics of the radiated microwave were clarified, and strong echoes corresponding to the edges of an aluminum disk were found. Based on these results, the feasibility of a ground penetrating radar was verified.

  1. Propagation of microwave radiation through an inhomogeneous plasma layer in a magnetic field

    Science.gov (United States)

    Balakirev, B. A.; Bityurin, V. A.; Bocharov, A. N.; Brovkin, V. G.; Vedenin, P. V.; Mashek, I. Ch; Pashchina, A. S.; Pervov, A. Yu; Petrovskiy, V. P.; Ryazanskiy, N. M.; Shkatov, O. Yu

    2018-01-01

    The problem of reliable microwave communication through a plasma sheath has its origin from the beginning of space flights. During reentry of spacecraft, the plasma layer can interrupt the communication. At sufficiently high plasma density, the plasma layer either reflects or attenuates radio wave communications to and from the vehicle. In this work, we present a simple analytical one-dimensional algorithm to study the propagation of electromagnetic (EM) waves through a nonuniform plasma layer in a static nonuniform magnetic field. The experimental study of the EM wave transmission and reflection through plasma layer was carried out on the (i) microwave set and (ii) on the unit using a high-voltage pulsed discharge.

  2. Diamond like carbon coatings deposited by microwave plasma CVD ...

    Indian Academy of Sciences (India)

    WINTEC

    photoelectron spectroscopy (XPS) and spectroscopic ellipsometry techniques for estimating sp. 3. /sp. 2 ratio. ... ion beam deposition (Savvidas 1986), pulsed laser deposi- ... carrier gas (10 sccm) by passing 150 watts of microwave power.

  3. Low Damage, High Anisotropy Inductively Coupled Plasma for Gallium Nitride based Devices

    KAUST Repository

    Ibrahim, Youssef H.

    2013-05-27

    Group III-nitride semiconductors possess unique properties, which make them versatile materials for suiting many applications. Structuring vertical and exceptionally smooth GaN profiles is crucial for efficient optical device operation. The processing requirements for laser devices and ridge waveguides are stringent as compared to LEDs and other electronic devices. Due to the strong bonding and chemically inert nature of GaN, dry etching becomes a critical fabrication step. The surface morphology and facet etch angle are analyzed using SEM and AFM measurements. The influence of different mask materials is also studied including Ni as well as a SiO2 and resist bilayer. The high selectivity Ni Mask is found to produce high sidewall angles ~79°. Processing parameters are optimized for both the mask material and GaN in order to achieve a highly anisotropic, smooth profile, without resorting to additional surface treatment steps. An optimizing a SF6/O2 plasma etch process resulted in smooth SiO2 mask sidewalls. The etch rate and GaN surface roughness dependence on the RF power was also examined. Under a low 2mTorr pressure, the RF and ICP power were optimized to 150W and 300W respectively, such that a smooth GaN morphology and sidewalls was achieved with reduced ion damage. The The AFM measurements of the etched GaN surface indicate a low RMS roughness ranging from 4.75 nm to 7.66 nm.

  4. Deposition of titanium nitride on Si(1 0 0) wafers using plasma focus

    International Nuclear Information System (INIS)

    Hussain, Tousif; Ahmad, R.; Khan, I.A.; Siddiqui, Jamil; Khalid, Nida; Bhatti, Arshad Saleem; Naseem, Shahzad

    2009-01-01

    Titanium nitride thin films were deposited on Si(1 0 0) substrates by using a low energy (2.3 KJ) Mather-type plasma focus device. The composition of the deposited films was characterized by X-ray diffraction (XRD). The crystallite size has strong dependence on the numbers of focus shots. The crystallinity of TiN thin films is found to increase with increasing the number of focus shots. The effect of different number of focus shots on micro structural changes of thin films was characterized by Scanning Electron Microscope (SEM) and Atomic Force Microscope (AFM). SEM results showed net-like structure for film deposited for 15 numbers of shots, which are elongated grains of Si 3 N 4 in amorphous form embedded into TiN crystals. The average surface roughness was calculated from AFM images of the thin films. These results indicated that the average surface roughness increased for films deposited with increased number of focus shots. The least crystallite size and roughness are observed for film deposited with 25 focus shots.

  5. Plasma Nitriding of AISI 304 Stainless Steel in Cathodic and Floating Electric Potential: Influence on Morphology, Chemical Characteristics and Tribological Behavior

    Science.gov (United States)

    Li, Yang; He, Yongyong; Wang, Wei; Mao, Junyuan; Zhang, Lei; Zhu, Yijie; Ye, Qianwen

    2018-03-01

    In direct current plasma nitriding (DCPN), the treated components are subjected to a high cathodic potential, which brings several inherent shortcomings, e.g., damage by arcing and the edging effect. In active screen plasma nitriding (ASPN) processes, the cathodic potential is applied to a metal screen that surrounds the workload, and the component to be treated is placed in a floating potential. Such an electrical configuration allows plasma to be formed on the metal screen surface rather than on the component surface; thus, the shortcomings of the DCPN are eliminated. In this work, the nitrided experiments were performed using a plasma nitriding unit. Two groups of samples were placed on the table in the cathodic and the floating potential, corresponding to the DCPN and ASPN, respectively. The floating samples and table were surrounded by a steel screen. The DCPN and ASPN of the AISI 304 stainless steels are investigated as a function of the electric potential. The samples were characterized using scanning electron microscopy with energy-dispersive x-ray spectroscopy, x-ray diffraction, atomic force microscopy and transmission electron microscope. Dry sliding ball-on-disk wear tests were conducted on the untreated substrate, DCPN and ASPN samples. The results reveal that all nitrided samples successfully produced similar nitrogen-supersaturated S phase layers on their surfaces. This finding also shows the strong impact of the electric potential of the nitriding process on the morphology, chemical characteristics, hardness and tribological behavior of the DCPN and ASPN samples.

  6. Plasma electron density measurement with multichannel microwave interferometer on the HL-1 tokamak device

    International Nuclear Information System (INIS)

    Xu Deming; Zhang Hongyin; Liu Zetian; Ding Xuantong; Li Qirui; Wen Yangxi

    1989-11-01

    A multichannel microwave interferometer which is composed of different microwave interferometers (one 2 mm band, one 4 mm band and two 8 mm band) has been used to measure the plasma electron density on HL-1 tokamak device. The electron density approaching to 5 x 10 13 cm -3 is measured by a 2 mm band microwave interferometer. In the determinable range, the electron density profile in the cross-section on HL-1 device has been measured by this interferometer. A microcomputer data processing system is also developed

  7. Characterization of low-temperature microwave loss of thin aluminum oxide formed by plasma oxidation

    Energy Technology Data Exchange (ETDEWEB)

    Deng, Chunqing, E-mail: cdeng@uwaterloo.ca; Otto, M.; Lupascu, A., E-mail: alupascu@uwaterloo.ca [Institute for Quantum Computing, Department of Physics and Astronomy, and Waterloo Institute for Nanotechnology, University of Waterloo, Waterloo, Ontario N2L 3G1 (Canada)

    2014-01-27

    We report on the characterization of microwave loss of thin aluminum oxide films at low temperatures using superconducting lumped resonators. The oxide films are fabricated using plasma oxidation of aluminum and have a thickness of 5 nm. We measure the dielectric loss versus microwave power for resonators with frequencies in the GHz range at temperatures from 54 to 303 mK. The power and temperature dependence of the loss are consistent with the tunneling two-level system theory. These results are relevant to understanding decoherence in superconducting quantum devices. The obtained oxide films are thin and robust, making them suitable for capacitors in compact microwave resonators.

  8. INFLUENCE OF PLASMA NITRIDING ON THE CORROSION BEHAVIOUR AND ADHESION OF DLC COATINGS DEPOSITED ON AISI 420 STAINLESS STEEL

    Directory of Open Access Journals (Sweden)

    Jorge N. Pecina

    2016-06-01

    Full Text Available In this work the corrosion behavior and adhesion of two DLC (“Diamond Like Carbon” films (“Soft” and “Hard” were studied. Both coatings were deposited by PACVD (“Plasma Assisted Chemical Vapour Deposition” on plasma-nitrided and non-nitrided AISI 420 stainless steel. Raman spectroscopy was conducted and surface hardness was measured. The microstructure by OM and SEM, was observed. Adhesion tests were performed with C. Rockwell indentation test. Salt Spray and immersion were performed in HCl. The “Soft” coating was 20 μm thick, the “Hard” film was about 2.5 μm. The hardness was of 500 HV in the “Soft” DLC and 1400 HV in the “Hard” DLC. Both coatings presented low friction coefficient and good adhesion when they were deposited on nitrided steel. Also presented good resistance to atmospheric corrosion. HCl DLC degradation slowed rapidly introduced uncoated samples.

  9. Passivation of Ge/high-κ interface using RF Plasma nitridation

    Science.gov (United States)

    Dushaq, Ghada; Nayfeh, Ammar; Rasras, Mahmoud

    2018-01-01

    In this paper, plasma nitridation of a germanium surface using NH3 and N2 gases is performed with a standard RF-PECVD method at a substrate temperature of 250 °C. The structural and optical properties of the Ge surface have been investigated using Atomic Force Microscopy (AFM), Fourier Transform Infrared Spectroscopy (FT-IR), and Variable Angle Spectroscopic Ellipsometery (VASE). Study of the Ge (100) surface revealed that it is nitrated after plasma treatment while the GeO2 regrowth on the surface has been suppressed. Also, stability of the treated surface under air exposure is observed, where all the measurements were performed at room ambient. The electrical characteristics of fabricated Al/Ti/HfO2/GeON/p-Ge capacitors using the proposed surface treatment technique have been investigated. The C-V curves indicated a negligible hysteresis compared to ˜500 mV observed in untreated samples. Additionally, the C-V characteristic is used to extract the high-κ/Ge interface trap density using the most commonly used methods in determining the interface traps. The discussion includes the Dit calculation from the high-low frequency (Castagné-Vapaille) method and Terman (high-frequency) method. The high-low frequency method indicated a low interface trap density of ˜2.5 × 1011 eV-1.cm-2 compared to the Terman method. The J-V measurements revealed more than two orders of magnitude reduction of the gate leakage. This improved Ge interface quality is a promising low-temperature technique for fabricating high-performance Ge MOSFETs.

  10. XUV laser-produced plasma sheet beam and microwave agile mirror

    International Nuclear Information System (INIS)

    Shen, W.; Scharer, J.E.; Porter, B.; Lam, N.T.

    1994-01-01

    An excimer-laser (λ = 193 nm) produced plasma in an organic gas (TMAE) has been generated and studied. These studies have determined the ion-electron recombination coefficient and the photon absorption cross-section, of the neutral gas. The dependences of wave transmission, reflection and absorption on plasma density are obtained. A new optical system with an array of cylindrical XUV coated lenses has been implemented to form a plasma sheet to study its usage as agile mirror microwave reflector. The lens system expands the incident laser beam in X direction and compresses it in Y direction to form a sheet beam. The expanded beam then passes through a vacuum chamber filled with TMAE at 50--500 nTorr to produce the plasma sheet. Space-time measurements of the plasma density and temperature as measured by a Langmuir probe are presented. XUV optical measurements of the laser beam as measured by a photodiode are presented. Initial experiments have generated a plasma sheet of 5--10 mm x 11 cm with peak plasma density of 5 x 10 13 cm -3 . A microwave source will be utilized to study the agile mirror character of the plasma sheet. Modeling of the microwave reflection from the plasma profile will also be discussed

  11. Plasma source by microwaves: design description; Fuente de plasma por microondas: descripcion de diseno

    Energy Technology Data Exchange (ETDEWEB)

    Camps, E; Olea, O; Andrade, R; Anguiano, G

    1992-03-15

    The design of a device for the formation of a plasma with densities of the order of 10{sup 12} cm{sup -} {sup 3} and low temperatures (T{sub e} {approx} 40 eV) is described. For such purpose it was carried out in the device a microwave discharge (f{sub o} = 2.45 GHz) in a resonator of high Q factor, immersed in a static external magnetic field. The device worked in the regime {omega}{sub ce} {<=} {omega}{sub o}/2 ({omega}{sub ce}- cyclotron frequency of the electrons, ({omega}{sub o} = 2 {pi} f{sub o}) where is possible the excitement of non lineal phenomena of waves transformation. (Author)

  12. Production of hydrogen via conversion of hydrocarbons using a microwave plasma

    International Nuclear Information System (INIS)

    Jasinski, Mariusz; Dors, Miroslaw; Nowakowska, Helena; Mizeraczyk, Jerzy; Nichipor, Gerietta V

    2011-01-01

    In this paper, results of hydrogen production from hydrocarbons in an atmospheric pressure microwave plasma are presented. As sources of hydrogen, both methane CH 4 and tetrafluoroethane C 2 H 2 F 4 were tested. A new waveguide-based nozzleless cylinder-type microwave plasma source was used to convert hydrocarbons into hydrogen. The processed gaseous hydrocarbons were introduced into the plasma by four gas ducts which formed a swirl flow in the plasma reactor. The absorbed microwave power was up to 5 kW. The gas flow rate was up to 212 L min -1 . The hydrogen mass yield rate and the corresponding energetic hydrogen mass yield were up to 866 g[H 2 ] h -1 and 577 g [H 2 ] kWh -1 of microwave energy absorbed by the plasma, respectively. These parameters are better than our previous results when nitrogen was used as a swirl gas and much better than those typical for other plasma methods of hydrogen production (electron beam, gliding arc, plasmatron).

  13. Production of hydrogen via conversion of hydrocarbons using a microwave plasma

    Energy Technology Data Exchange (ETDEWEB)

    Jasinski, Mariusz; Dors, Miroslaw; Nowakowska, Helena; Mizeraczyk, Jerzy [Centre for Plasma and Laser Engineering, The Szewalski Institute of Fluid-Flow Machinery, Polish Academy of Sciences, Fiszera 14, 80-952 Gdansk (Poland); Nichipor, Gerietta V, E-mail: mj@imp.gda.pl [Joint Institute of Power and Nuclear Research, Academy of Sciences of Belarus, Minsk, Sosny 220109 (Belarus)

    2011-05-18

    In this paper, results of hydrogen production from hydrocarbons in an atmospheric pressure microwave plasma are presented. As sources of hydrogen, both methane CH{sub 4} and tetrafluoroethane C{sub 2}H{sub 2}F{sub 4} were tested. A new waveguide-based nozzleless cylinder-type microwave plasma source was used to convert hydrocarbons into hydrogen. The processed gaseous hydrocarbons were introduced into the plasma by four gas ducts which formed a swirl flow in the plasma reactor. The absorbed microwave power was up to 5 kW. The gas flow rate was up to 212 L min{sup -1}. The hydrogen mass yield rate and the corresponding energetic hydrogen mass yield were up to 866 g[H{sub 2}] h{sup -1} and 577 g [H{sub 2}] kWh{sup -1} of microwave energy absorbed by the plasma, respectively. These parameters are better than our previous results when nitrogen was used as a swirl gas and much better than those typical for other plasma methods of hydrogen production (electron beam, gliding arc, plasmatron).

  14. Coating of Titanium Nitride on Stainless Steel Targets by a 4 kJ Plasma Focus Device

    Science.gov (United States)

    Omrani, M.; Habibi, M.; Amrollahi, R.

    2012-08-01

    Titanium nitride thin films were deposited on stainless steel (SS316L) targets by using a 4 kJ plasma focus device. The corresponding energy flux delivered to SS316L surface is estimated to be 2.69 × 1013 kev cm-3 ns-1. X-ray diffraction analysis reveals the formation of a nanocrystalline titanium nitride coating on the surface of targets. Thickness of the elements found on the surface of treated samples which are obtained by Rutherford backscattering spectrometry analysis (RBS) were (×1015 at/cm2) .45% Ti, 50% N and 5% Fe. Scanning electron microscopy was used to indicate changes in surface morphology. Existence of grains in different size confirms the formation of TiN crystals on the surface of targets.

  15. Pre-launch simulation experiment of microwave-ionosphere nonlinear interaction rocket experiment in the space plasma chamber

    Energy Technology Data Exchange (ETDEWEB)

    Kaya, N. (Kobe University, Kobe, Japan); Tsutsui, M. (Kyoto University, Uji, Japan); Matsumoto, H. (Kyoto University, Kyoto, Japan)

    1980-09-01

    A pre-flight test experiment of a microwave-ionosphere nonlinear interaction rocket experiment (MINIX) has been carried out in a space plasma simulation chamber. Though the first rocket experiment ended up in failure because of a high voltage trouble, interesting results are observed in the pre-flight experiment. A significant microwave heating of plasma up to 300% temperature increase is observed. Strong excitations of plasma waves by the transmitted microwaves in the VLF and HF range are observed as well. These microwave effects may have to be taken into account in solar power satellite projects in the future.

  16. Study of corrosion resistance properties of nitrided carbon steel using radiofrequency N{sub 2}/H{sub 2} cold plasma process

    Energy Technology Data Exchange (ETDEWEB)

    Bouanis, F.Z. [Unite Materiaux et Transformations (UMET), Ingenierie des Systemes Polymeres, CNRS UMR 8207, ENSCL, BP 90108, F-59652 Villeneuve d' Ascq Cedex (France); Jama, C., E-mail: charafeddine.jama@ensc-lille.f [Unite Materiaux et Transformations (UMET), Ingenierie des Systemes Polymeres, CNRS UMR 8207, ENSCL, BP 90108, F-59652 Villeneuve d' Ascq Cedex (France); Traisnel, M. [Unite Materiaux et Transformations (UMET), Ingenierie des Systemes Polymeres, CNRS UMR 8207, ENSCL, BP 90108, F-59652 Villeneuve d' Ascq Cedex (France); Bentiss, F. [Laboratoire de Chimie de Coordination et d' Analytique, Faculte des Sciences, Universite Chouaib Doukkali, B.P. 20, M-24000 El Jadida (Morocco)

    2010-10-15

    C38 carbon steel have been plasma-nitrided using a radiofrequency cold plasma discharge treatment in order to investigate the influence of gas composition on corrosion behaviour of nitrided substrates. The investigated C38 steel was nitrided by a RF plasma discharge treatment using two different gas mixtures (75% N{sub 2}/25% H{sub 2} and 25% N{sub 2}/75% H{sub 2}) at different times of plasma-treatment on non-heated substrates. Electron Probe Microanalysis (EPMA) showed that the nitrided layer formed using 75% N{sub 2}/25% H{sub 2} gas mixture was thicker compared to those formed in the case of 25% N{sub 2}/75% H{sub 2} or pure N{sub 2}. The modifications of the corrosion resistance characteristics of plasma-nitrided C38 steel in 1 M HCl solution were investigated by weight loss measurements and ac impedance technique. The results obtained from these two evaluation methods were in good agreement. It was shown that the nitriding treatment in both cases (75% N{sub 2}/25% H{sub 2} and 25% N{sub 2}/75% H{sub 2}) improves the corrosion resistance of investigated carbon steel, while the better performance is obtained for the 75% N{sub 2}/25% H{sub 2} gas mixture. X-ray photoelectron spectroscopy (XPS) was carried out before and after immersion in corrosive medium in order to establish the mechanism of corrosion inhibition using N{sub 2}/H{sub 2} cold plasma nitriding process.

  17. Experimental and numerical studies of microwave-plasma interaction in a MWPECVD reactor

    Directory of Open Access Journals (Sweden)

    A. Massaro

    2016-12-01

    Full Text Available This work deals with and proposes a simple and compact diagnostic method able to characterize the interaction between microwave and plasma without the necessity of using an external diagnostic tool. The interaction between 2.45 GHz microwave and plasma, in a typical ASTeX-type reactor, is investigated from experimental and numerical view points. The experiments are performed by considering plasmas of three different gas mixtures: H2, CH4-H2 and CH4-H2-N2. The two latter are used to deposit synthetic undoped and n-doped diamond films. The experimental setup equipped with a matching network enables the measurements of very low reflected power. The reflected powers show ripples due to the mismatching between wave and plasma impedance. Specifically, the three types of plasma exhibit reflected power values related to the variation of electron-neutral collision frequency among the species by changing the gas mixture. The different gas mixtures studied are also useful to test the sensitivity of the reflected power measurements to the change of plasma composition. By means of a numerical model, only the interaction of microwave and H2 plasma is examined allowing the estimation of plasma and matching network impedances and of reflected power that is found about eighteen times higher than that measured.

  18. GYRO-INTERACTION OF MICROWAVES IN MAGNETO PLASMAS IN ATMOSPHERIC GASES

    Energy Technology Data Exchange (ETDEWEB)

    Narasinga Rao, K. V.; Goldstein, L.

    1963-05-15

    Electron cyclotron resonance absorption of microwave energy by the electron gas in decaying magneto plasmas of oxygen and nitrogen gases is investigated. The technique of interaction of microwaves of diffent frequencies is utilized to measure the enhancement in electronic energy caused by resonance absorption. The results of these experiments show that the inelastic collisions of low energy electrons introduce a barrier for rapid heating of the electron gas. The implication of these results to the control of the ionospheric plasma parameters by radio frequency EM waves is discussed. (auth)

  19. A simple microwave technique for plasma density measurement using frequency modulation

    International Nuclear Information System (INIS)

    Bora, D.; Jayakumar, R.; Vijayashankar, M.K.

    1984-01-01

    A simple method of determining the phase variation unambiguously during microwave interferometric measurement is described. The frequency of the Klystron source is modulated with the help of staircase voltage pulse. The height of each stair is adjusted such that the corresponding phase shift in the test branch with an additional path length is 90 0 . Signals, proportional to cosine and sine of the phase shift due to plasma, can be generated in the same channel and plasma density information can be inferred. The microwave hardware remains the same as in conventional interferometry and the cost of such a scheme is low. (author)

  20. Bragg scattering of electromagnetic waves by microwave-produced plasma layers

    Science.gov (United States)

    Kuo, S. P.; Zhang, Y. S.

    1990-01-01

    A set of parallel plasma layers is generated by two intersecting microwave pulses in a chamber containing dry air at a pressure comparable to the upper atmosphere. The dependencies of breakdown conditions on the pressure and pulse length are examined. The results are shown to be consistent with the appearance of tail erosion of the microwave pulse caused by air breakdown. A Bragg scattering experiment, using the plasma layers as a Bragg reflector, is then performed. Both time domain and frequency domain measurements of wave scattering are conducted. The experimental results are found to agree very well with the theory.

  1. Propagation of Polarized Cosmic Microwave Background Radiation in an Anisotropic Magnetized Plasma

    International Nuclear Information System (INIS)

    Moskaliuk, S. S.

    2010-01-01

    The polarization plane of the cosmic microwave background radiation (CMBR) can be rotated either in a space-time with metric of anisotropic type and in a magnetized plasma or in the presence of a quintessential background with pseudoscalar coupling to electromagnetism. A unified treatment of these three phenomena is presented for cold anisotropic plasma at the pre-recombination epoch. It is argued that the generalized expressions derived in the present study may be relevant for direct searches of a possible rotation of the cosmic microwave background polarization.

  2. Microwave irradiation-assisted deposition of Ga2O3 on III-nitrides for deep-UV opto-electronics

    Science.gov (United States)

    Jaiswal, Piyush; Ul Muazzam, Usman; Pratiyush, Anamika Singh; Mohan, Nagaboopathy; Raghavan, Srinivasan; Muralidharan, R.; Shivashankar, S. A.; Nath, Digbijoy N.

    2018-01-01

    We report on the deposition of Ga2O3 on III-nitride epi-layers using the microwave irradiation technique. We also report on the demonstration of a Ga2O3 device: a visible-blind, deep-UV detector, with a GaN-based heterostructure as the substrate. The film deposited in the solution medium, at <200 °C, using a metalorganic precursor, was nanocrystalline. XRD confirms that the as-deposited film, when annealed at high temperature, turns to polycrystalline β-Ga2O3. SEM shows the as-deposited film to be uniform, with a surface roughness of 4-5 nm, as revealed by AFM. Interdigitated metal-semiconductor-metal devices with Ni/Au contact exhibited a peak spectral response at 230 nm and a good visible rejection ratio. This demonstration of a deep-UV detector on the β-Ga2O3/III-nitride stack is expected to open up possibilities of functional and physical integration of β-Ga2O3 and GaN material families towards enabling next-generation high-performance devices by exciting band and heterostructure engineering.

  3. Slit shaped microwave induced atmospheric pressure plasma based on a parallel plate transmission line resonator

    Science.gov (United States)

    Kang, S. K.; Seo, Y. S.; Lee, H. Wk; Aman-ur-Rehman; Kim, G. C.; Lee, J. K.

    2011-11-01

    A new type of microwave-excited atmospheric pressure plasma source, based on the principle of parallel plate transmission line resonator, is developed for the treatment of large areas in biomedical applications such as skin treatment and wound healing. A stable plasma of 20 mm width is sustained by a small microwave power source operated at a frequency of 700 MHz and a gas flow rate of 0.9 slm. Plasma impedance and plasma density of this plasma source are estimated by fitting the calculated reflection coefficient to the measured one. The estimated plasma impedance shows a decreasing trend while estimated plasma density shows an increasing trend with the increase in the input power. Plasma uniformity is confirmed by temperature and optical emission distribution measurements. Plasma temperature is sustained at less than 40 °C and abundant amounts of reactive species, which are important agents for bacteria inactivation, are detected over the entire plasma region. Large area treatment ability of this newly developed device is verified through bacteria inactivation experiment using E. coli. Sterilization experiment shows a large bacterial killing mark of 25 mm for a plasma treatment time of 10 s.

  4. Investigation on computation of elliptical microwave plasma cavity

    Science.gov (United States)

    Liao, Xiaoli; Liu, Hua; Zhang, Kai

    2008-12-01

    In recent years, the advance of the elliptical resonant cavity and focus cavity is known by many people. There are homogeneous and multipatternal virtues in the focus dimensional microwave field of the elliptical resonant cavity. It is very suitable for applying the low power microwave biological effect equipment. However, when designing the elliptical resonant cavity may meet the problems of complex and huge computation need to be solved. This paper proposed the simple way of approximate processing the Mathieu function. It can greatly simplify the difficulty and decrease the scale of computation. This method can satisfy the requirements of research and development within project permitted precision.

  5. Review of research and development on the microwave-plasma electrothermal rocket

    Energy Technology Data Exchange (ETDEWEB)

    Hawley, M.C.; Asmussen, J.; Filpus, J.W.; Frasch, L.L.; Whitehair, S.

    1987-01-01

    The microwave-plasma electrothermal rocket (MWPETR) shows promise for spacecraft propulsion and maneuvering, without some of the drawbacks of competitive electric propulsion systems. In the MWPETR, the electric power is first converted to microwave-frequency radiation. In a specially-designed microwave cavity system, the electromagnetic energy of the radiation is transferred to the electrons in a plasma sustained in the working fluid. The resulting high-energy electrons transfer their energy to the atoms and molecules of the working fluid by collisions. The working fluid, thus heated, expands through a nozzle to generate thrust. In the MWPETR, no electrodes are in contact with the working fluid, the energy is transferred into the working fluid by nonthermal mechanisms, and the main requirement for the materials of construction is that the walls of the plasma chamber be insulating and transparent to microwave radiation at operating conditions. In this survey of work on the MWPETR, several experimental configurations are described and compared. Diagnostic methods used in the study are described and compared, including titration, spectroscopy, calorimetry, electric field measurements, gas-dynamic methods, and thrust measurements. Measured and estimated performance efficiencies are reported. Results of computer modeling of the plasma and of the gas flowing from the plasma are summarized. 32 references.

  6. The study of tribological and corrosion behavior of plasma nitrided 34CrNiMo6 steel under hot and cold wall conditions

    International Nuclear Information System (INIS)

    Maniee, A.; Mahboubi, F.; Soleimani, R.

    2014-01-01

    Highlights: • 34CrNiMo6 steel was plasma nitrided under hot and cold wall conditions. • The amount of ε phase in hot wall condition was more than that of cold wall condition. • Wear resistance of hot wall nitrided samples was more than cold wall treated ones. • Hot wall nitriding provides better corrosion behavior than cold wall nitriding. - Abstract: This paper reports on a comparative study of tribological and corrosion behavior of plasma nitrided 34CrNiMo6 low alloy steel under modern hot wall condition and conventional cold wall condition. Plasma nitriding was carried out at 500 °C and 550 °C with a 25% N 2 + 75% H 2 gas mixture for 8 h. The wall temperature of the chamber in hot wall condition was set to 400 °C. The treated specimens were characterized by using scanning electron microscopy (SEM), X-ray diffraction (XRD), microhardness and surface roughness techniques. The wear test was performed by pin-on-disc method. Potentiodynamic polarization and electrochemical impedance spectroscopy (EIS) tests were also used to evaluate the corrosion resistance of the samples. The results demonstrated that in both nitriding conditions, wear and corrosion resistance of the treated samples decrease with increasing temperature from 500 °C to 550 °C. Moreover, nitriding under hot wall condition at the same temperature provided slightly better tribological and corrosion behavior in comparison with cold wall condition. In consequence, the lowest friction coefficient, and highest wear and corrosion resistance were found on the sample treated under hot wall condition at 500 °C, which had the maximum surface hardness and ε-Fe 2–3 N phase

  7. Non-equilibrium microwave plasma for efficient high temperature chemistry

    NARCIS (Netherlands)

    van den Bekerom, D.C.M.; den Harder, N.; Minea, T.; Palomares Linares, J.M.; Bongers, W.; van de Sanden, M.C.M.; van Rooij, G.J.

    2017-01-01

    This article describes a flowing microwave reactor that is used to drive efficient non-equilibrium chemistry for the application of conversion/activation of stable molecules such as CO2, N2 and CH4. The goal of the procedure described here is to measure the in situ gas temperature and gas

  8. Influence of substrate pre-treatments by Xe{sup +} ion bombardment and plasma nitriding on the behavior of TiN coatings deposited by plasma reactive sputtering on 100Cr6 steel

    Energy Technology Data Exchange (ETDEWEB)

    Vales, S., E-mail: sandra.vales@usp.br [Universidade de São Paulo (USP), Escola de Engenharia de São Carlos, Av. Trabalhador São Carlense 400, São Carlos, SP CEP 13566-590 (Brazil); Brito, P., E-mail: ppbrito@gmail.com [Pontifícia Universidade Católica de Minas Gerais (PUC-MG), Av. Dom José Gaspar 500, 30535-901 Belo Horizonte, MG (Brazil); Pineda, F.A.G., E-mail: pipe8219@gmail.com [Universidade de São Paulo (USP), Escola de Engenharia de São Carlos, Av. Trabalhador São Carlense 400, São Carlos, SP CEP 13566-590 (Brazil); Ochoa, E.A., E-mail: abigail_ochoa@hotmail.com [Universidade Estadual de Campinas (UNICAMP), Campus Universitário Zeferino Vaz, Barão Geraldo, Campinas, SP CEP 13083-970 (Brazil); Droppa, R., E-mail: roosevelt.droppa@ufabc.edu.br [Universidade Federal do ABC (UFABC), Av. dos Estados, 5001, Santo André, SP CEP 09210-580 (Brazil); Garcia, J., E-mail: jose.garcia@sandvik.com [Sandvik Coromant R& D, Lerkrogsvägen 19, SE-12680, Stockholm (Sweden); Morales, M., E-mail: monieriz@gmail.com [Universidade Estadual de Campinas (UNICAMP), Campus Universitário Zeferino Vaz, Barão Geraldo, Campinas, SP CEP 13083-970 (Brazil); Alvarez, F., E-mail: alvarez@ifi.unicamp.br [Universidade Estadual de Campinas (UNICAMP), Campus Universitário Zeferino Vaz, Barão Geraldo, Campinas, SP CEP 13083-970 (Brazil); and others

    2016-07-01

    In this paper the influence of pre-treating a 100Cr6 steel surface by Xe{sup +} ion bombardment and plasma nitriding at low temperature (380 °C) on the roughness, wear resistance and residual stresses of thin TiN coatings deposited by reactive IBAD was investigated. The Xe{sup +} ion bombardment was carried out using a 1.0 keV kinetic energy by a broad ion beam assistance deposition (IBAD, Kaufman cell). The results showed that in the studied experimental conditions the ion bombardment intensifies nitrogen diffusion by creating lattice imperfections, stress, and increasing roughness. In case of the combined pre-treatment with Xe{sup +} ion bombardment and subsequent plasma nitriding, the samples evolved relatively high average roughness and the wear volume increased in comparison to the substrates exposed to only nitriding or ion bombardment. - Highlights: • Effect of Xe ion bombardment and plasma nitriding on TiN coatings was investigated. • Xe ion bombardment with 1.0 KeV increases nitrogen retention in plasma nitriding. • 1.0 KeV ion impact energy causes sputtering, thus increasing surface roughness. • TiN coating wear is minimum after plasma nitriding due to lowest roughness.

  9. Effect of pulsed duty cycle control on tribological and corrosion properties of AISI-316 in cathodic cage plasma nitriding

    Science.gov (United States)

    Naeem, M.; Raza, H. A.; Shafiq, M.; Zaka-ul-Islam, M.; Iqbal, Javed; Díaz-Guillén, J. C.; Zakaullah, M.

    2017-11-01

    Austenitic stainless steels are of prime importance in many industrial sectors because of their excellent corrosion resistance; however, their poor mechanical and tribological features lead to their reduced applicability. In this regard, low-temperature cathodic cage plasma nitriding (CCPN) can be used to improve surface properties of steels without scarifying the inherent corrosion resistance. In this study, AISI-316 samples are processed in CCPN reactor at a temperature of 400 °C, for the treatment time of 4 h, at a pressure of 150 Pa and variable pulsed duty cycle (15-75%). The microstructure and mechanical features are analyzed using x-ray diffraction, scanning electron microscopy, microhardness tester and ball-on-disc wear tester. The anodic polarization test in 3.5% NaCl is conducted to examine the corrosion properties. The results show that hardness is enhanced up to 1327 HV at low duty cycle, which is considerably higher than base material (278 HV). The wear rate is found to be reduced up to 90% over base material by processing at low duty cycle. The base material exhibits severe abrasive wear, and the nitrided sample has dominant adhesive wear. The corrosion rate is found to be reduced up to 95% over base material for the sample nitrided at low duty cycle. This study shows that wear and corrosion resistance in CCPN can be significantly boosted by reducing the pulsed duty cycle.

  10. Plasma Stabilization in Low-Power C Band Microwave Arcjets

    National Research Council Canada - National Science Library

    Micci, Michael

    1999-01-01

    .... Emission spectroscopy of the plasma was made in order to measure the plasma electron temperature at different specific power levels, and the assumption of Local Thermodynamic Equilibrium (LTE) was examined...

  11. Early results of microwave transmission experiments through an overly dense rectangular plasma sheet with microparticle injection

    Energy Technology Data Exchange (ETDEWEB)

    Gillman, Eric D., E-mail: eric.gillman.ctr@nrl.navy.mil [National Research Council Postdoctoral Associate at the U.S. Naval Research Laboratory, Washington, DC 20375 (United States); Amatucci, W. E. [U.S. Naval Research Laboratory, Washington, DC 20375 (United States)

    2014-06-15

    These experiments utilize a linear hollow cathode to create a dense, rectangular plasma sheet to simulate the plasma layer surrounding vehicles traveling at hypersonic velocities within the Earth's atmosphere. Injection of fine dielectric microparticles significantly reduces the electron density and therefore lowers the electron plasma frequency by binding a significant portion of the bulk free electrons to the relatively massive microparticles. Measurements show that microwave transmission through this previously overly dense, impenetrable plasma layer increases with the injection of alumina microparticles approximately 60 μm in diameter. This method of electron depletion is a potential means of mitigating the radio communications blackout experienced by hypersonic vehicles.

  12. Microparticle injection effects on microwave transmission through an overly dense plasma layer

    Energy Technology Data Exchange (ETDEWEB)

    Gillman, Eric D., E-mail: eric.gillman@nrl.navy.mil; Amatucci, W. E. [Naval Research Laboratory, Washington, DC 20375 (United States); Williams, Jeremiah [Wittenberg University, Springfield, Ohio 45501 (United States); Compton, C. S. [Sotera Defense Solutions, Herndon, Virginia 20171 (United States)

    2015-04-15

    Microparticles injected into a plasma have been shown to deplete the free electron population as electrons are collected through the process of microparticles charging to the plasma floating potential. However, these charged microparticles can also act to scatter electromagnetic signals. These experiments investigate microwave penetration through a previously impenetrable overly dense plasma layer as microparticles are injected and the physical phenomena associated with the competing processes that occur due to electron depletion and microwave scattering. The timescales for when each of these competing processes dominates is analyzed in detail. It was found that while both processes play a significant and dominant role at different times, ultimately, transmission through this impenetrable plasma layer can be significantly increased with microparticle injection.

  13. Microwave frequency sweep interferometer for plasma density measurements in ECR ion sources: Design and preliminary results

    Energy Technology Data Exchange (ETDEWEB)

    Torrisi, Giuseppe [INFN - Laboratori Nazionali del Sud, Via S. Sofia 62, 95125 Catania (Italy); University Mediterranea of Reggio Calabria, Reggio Calabria (Italy); Mascali, David; Neri, Lorenzo; Leonardi, Ornella; Celona, Luigi; Castro, Giuseppe; Agnello, Riccardo; Caruso, Antonio; Passarello, Santi; Longhitano, Alberto; Gammino, Santo [INFN - Laboratori Nazionali del Sud, Via S. Sofia 62, 95125 Catania (Italy); Sorbello, Gino [INFN - Laboratori Nazionali del Sud, Via S. Sofia 62, 95125 Catania (Italy); University of Catania, Catania, Italy and INFN-LNS, Catania (Italy); Isernia, Tommaso [University Mediterranea of Reggio Calabria, Reggio Calabria (Italy)

    2016-02-15

    The Electron Cyclotron Resonance Ion Sources (ECRISs) development is strictly related to the availability of new diagnostic tools, as the existing ones are not adequate to such compact machines and to their plasma characteristics. Microwave interferometry is a non-invasive method for plasma diagnostics and represents the best candidate for plasma density measurement in hostile environment. Interferometry in ECRISs is a challenging task mainly due to their compact size. The typical density of ECR plasmas is in the range 10{sup 11}–10{sup 13} cm{sup −3} and it needs a probing beam wavelength of the order of few centimetres, comparable to the chamber radius. The paper describes the design of a microwave interferometer developed at the LNS-INFN laboratories based on the so-called “frequency sweep” method to filter out the multipath contribution in the detected signals. The measurement technique and the preliminary results (calibration) obtained during the experimental tests will be presented.

  14. Removal of volatile organic compounds by a high pressure microwave plasma torch

    International Nuclear Information System (INIS)

    Rubio, S.J.; Quintero, M.C.; Rodero, A.; Alvarez, R.

    2004-01-01

    A helium microwave plasma torch was studied and optimised as a destruction system of volatile organic compounds. Attention was focused on trichloroethylene as a prototypical volatile organic compound, which is used technologically and which poses known health risks. The dependence of the destruction efficiency on the plasma conditions was obtained for different values of trichloroethylene concentrations. The results show a destruction and removal efficiency greater than 99.999% (Authors)

  15. Production of nitric oxide using a microwave plasma torch and its application to fungal cell differentiation

    International Nuclear Information System (INIS)

    Na, Young Ho; Kang, Min-Ho; Cho, Guang Sup; Choi, Eun Ha; Park, Gyungsoon; Uhm, Han Sup; Kumar, Naresh

    2015-01-01

    The generation of nitric oxide by a microwave plasma torch is proposed for its application to cell differentiation. A microwave plasma torch was developed based on basic kinetic theory. The analytical theory indicates that nitric oxide density is nearly proportional to oxygen molecular density and that the high-temperature flame is an effective means of generating nitric oxide. Experimental data pertaining to nitric oxide production are presented in terms of the oxygen input in units of cubic centimeters per minute. The apparent length of the torch flame increases as the oxygen input increases. The various levels of nitric oxide are observed depending on the flow rate of nitrogen gas, the mole fraction of oxygen gas, and the microwave power. In order to evaluate the potential of nitric oxide as an activator of cell differentiation, we applied nitric oxide generated from the microwave plasma torch to a model microbial cell (Neurospora crassa: non-pathogenic fungus). Germination and hyphal differentiation of fungal cells were not dramatically changed but there was a significant increase in spore formation after treatment with nitric oxide. In addition, the expression level of a sporulation related gene acon-3 was significantly elevated after 24 h upon nitric oxide treatment. Increase in the level of nitric oxide, nitrite and nitrate in water after nitric oxide treatment seems to be responsible for activation of fungal sporulation. Our results suggest that nitric oxide generated by plasma can be used as a possible activator of cell differentiation and development. (paper)

  16. Diffusion and drift regimes of plasma ionization wave propagation in a microwave field

    International Nuclear Information System (INIS)

    Khodataev, K.V.; Gorelik, B.R.

    1997-01-01

    Investigation into diffusion and drift modes of a plasma ionization wave propagation in the microwave field are conducted within the framework of a one-dimensional model with regard to gas ionization by electron shock in an electrical field, adhesion, mobility and diffusion of electrons

  17. Microwave-driven plasma gasification for biomass waste treatment at miniature scale

    NARCIS (Netherlands)

    Sturm, G.S.J.; Navarrete Muñoz, A.; Purushothaman Vellayani, A.; Stefanidis, G.

    2016-01-01

    Gasification technology may combine waste treatment with energy generation. Conventional gasification processes are bulky and inflexible. By using an external energy source, in the form of microwave-generated plasma, equipment size may be reduced and flexibility as regards to the feed composition

  18. Microwave and plasma-assisted modification of composite fiber surface topography

    Science.gov (United States)

    Paulauskas, Felix L [Knoxville, TN; White, Terry L [Knoxville, TN; Bigelow, Timothy S [Knoxville, TN

    2003-02-04

    The present invention introduces a novel method for producing an undulated surface on composite fibers using plasma technology and microwave radiation. The undulated surface improves the mechanical interlocking of the fibers to composite resins and enhances the mechanical strength and interfacial sheer strength of the composites in which they are introduced.

  19. Microwave and optical diagnostics in a gadolinium plasma; Diagnostics hyperfrequence et optique dans un plasma magnetise de gadolinium

    Energy Technology Data Exchange (ETDEWEB)

    Larousse, B. [CEA Centre d`Etudes de Saclay, 91 - Gif-sur-Yvette (France). Dept. des Procedes d`Enrichissement]|[Conservatoire National des Arts et Metiers (CNAM), 75 - Paris (France)

    1997-12-31

    The optimization of the separation process of the gadolinium isotopes by Ion Cyclotron Resonance requires a precise knowledge of the physical characteristics of the plasma. Thus, two kinds of diagnostics have been developed: the first one to estimate the microwave power inside the source and the second one to measure the density of atomic and ionic of the gadolinium inside the plasma source and in front of the collector. Microwave diagnostic: A microstrip antenna has been designed and developed in order to characterize the microwave at 36 GHz frequency in the plasma source. The experimental results for different plasma regimes are presented. The measurements inside the plasma source show a maximum of microwave absorption for an argon pressure of 10{sup -4} mb (93% of absorption of the incident wave in the conditions of isotope separation). Laser absorption diagnostic: The theory of laser absorption in presence of a magnetic field is recalled and the first results are presented. In the spectral range between 560 and 620 nm, corresponding to high energy levels of gadolinium, no signal is obtained so that the density is below the detection limit 10{sup 10} cm{sup -3}. In the spectral range between 380 and 400 nm, two lines are observed, issue from the fundamental and metastable (633 cm{sup -1}) levels. The density of metastable level of gadolinium ions is about 10{sup 10} cm{sup -3} with a relative precision of 15 % and its variation is studied as a function of argon pressure, at different sections of the plasma column (source, collector). The achieved set of measurements has been performed in order to check the theoretical models. (author) 32 refs.

  20. Synthesis of N-graphene using microwave plasma-based methods

    Science.gov (United States)

    Dias, Ana; Tatarova, Elena; Henriques, Julio; Dias, Francisco; Felizardo, Edgar; Abrashev, Miroslav; Bundaleski, Nenad; Cvelbar, Uros

    2016-09-01

    In this work a microwave atmospheric plasma driven by surface waves is used to produce free-standing graphene sheets (FSG). Carbonaceous precursors are injected into a microwave plasma environment, where decomposition processes take place. The transport of plasma generated gas-phase carbon atoms and molecules into colder zones of plasma reactor results in carbon nuclei formation. The main part of the solid carbon is gradually carried from the ``hot'' plasma zone into the outlet plasma stream where carbon nanostructures assemble and grow. Subsequently, the graphene sheets have been N-doped using a N2-Ar large-scale remote plasma treatment, which consists on placing the FSG on a substrate in a remote zone of the N2-Ar plasma. The samples were treated with different compositions of N2-Ar gas mixtures, while maintaining 1 mbar pressure in the chamber and a power applied of 600 W. The N-doped graphene sheets were characterized by scanning and by high-resolution transmission electron microscopy, X-ray photoelectron spectroscopy and Raman spectroscopy. Plasma characterization was also performed by optical emission spectroscopy. Work partially funded by Portuguese FCT - Fundacao para a Ciencia e a Tecnologia, under grant SFRH/BD/52413/2013 (PD-F APPLAuSE).

  1. The AMY experiment: Microwave emission from air shower plasmas

    Directory of Open Access Journals (Sweden)

    Alvarez-Muñiz J.

    2016-01-01

    Full Text Available You The Air Microwave Yield (AMY experiment investigate the molecular bremsstrahlung radiation emitted in the GHz frequency range from an electron beam induced air-shower. The measurements have been performed at the Beam Test Facility (BTF of Frascati INFN National Laboratories with a 510 MeV electron beam in a wide frequency range between 1 and 20 GHz. We present the apparatus and the results of the tests performed.

  2. Microwave Plasma Propulsion Systems for Defensive Counter-Space

    Science.gov (United States)

    2007-09-01

    microwave/ECR-based propulsion system. No electron cathode or neutralizer is needed. There are no electrodes to erode, sputter or damage. Measurement of...without the need for a cathode neutralizer, a wide range of performance parameters can be achieved by selecting the size and length of the resonance...EC • Earth Coverage Antenna NCA • Narrow coverege Antenna LNA • Low Noise Amplifier Rx • Receive Tx =Transmit IV IV TI.IO CMOI Figure 53

  3. Beam-plasma generators of stochastic microwave oscillations using for plasma heating in fusion and plasma-chemistry devices and ionospheric investigations

    Energy Technology Data Exchange (ETDEWEB)

    Mitin, L A; Perevodchikov, V I; Shapiro, A L; Zavyalov, M A [All-Russian Electrotechnical Inst., Moscow (Russian Federation); Bliokh, Yu P; Fajnberg, Ya B [Kharkov Inst. of Physics and Technology (Russian Federation)

    1997-12-31

    The results of theoretical and experimental investigations of a generator of stochastic microwave power based on a beam-plasma inertial feedback amplifier is discussed with a view to using stochastic oscillations for plasma heating. The plasma heating efficiency in the region of low-frequency resonance in the geometry of the Tokamak is considered theoretically. It is shown that the temperature of heating is proportional to the power multiplied by the spectra width of the noiselike signal. The creation and heating of plasma by stochastic microwave power in an oversized waveguide without external magnetic field is discussed with a view to plasma-chemistry applications. It is shown that the efficiency of heating are defined by the time of phase instability of the stochastic power. (author). 3 figs., 13 refs.

  4. Microstructure and local texture evolution by plasma nitriding in a 316L austenitic stainless steel and consequences on its fatigue durability

    International Nuclear Information System (INIS)

    Stinville, Jean-Charles

    2010-01-01

    The present study concerns the surface and mechanical properties induced by specific low temperature (∼400 C) plasma nitriding of an AISI 316L austenitic stainless steel largely used for structural component in nuclear and chemical industries. It focuses especially on its influence on the fatigue durability. The great advantages of this plasma nitriding process are to produce thick nitrided layers with a high concentration of nitrogen atoms in solid solution into the material and to preserve the stainless character of the substrate. As a consequence a new phase named expanded austenite or γ N phase is formed and the lattice expansion associated with the high supersaturation of interstitial nitrogen atoms results in residual compressive stresses at the surface that exceed 2 GPa. The surface is then strongly modified as a result of complex effects including some crystallographic plane rotation, plasticity and damage in some grains depending on their orientation. The considerable increase of hardness and wear resistance produced by plasma nitriding of austenitic stainless steels is now well documented but there are practically no data on the influence on fatigue properties. Series of fatigue tests in air at room temperature carried out in the low cycle fatigue range show a significant improvement of the fatigue life. The results are discussed especially taking into account the compressive residual stresses induced by the nitrided layer. (authors)

  5. Effect of plasma formation on electron pinching and microwave emission in a virtual cathode oscillator

    International Nuclear Information System (INIS)

    Yatsuzuka, M.; Nakayama, M.; Nobuhara, S.; Young, D.; Ishihara, O.

    1996-01-01

    Time and spatial evolutions of anode and cathode plasmas in a vircator diode were observed with a streak camera. A cathode plasma appeared immediately after the rise of a beam current and was followed by an anode plasma typically after about 30 ns. Both plasmas expanded with almost the same speed of order of 104 m/s. The anode plasma was confirmed as a hydrogen plasma with an optical filter for H β line and study of anode-temperature rise. Electron beam pinching immediately followed by microwave emission was observed at the beam current less than the critical current for diode pinching in the experiment and the simulation. The electron beam current in the diode region is well characterized by the electron space-charge-limited current in bipolar flow with the expanding plasmas between the anode-cathode gap. As a result, electron bombardment produced the anode plasma, which made the electron beam strongly pinched, resulting in virtual cathode formation and microwave emission. (author). 5 figs., 5 refs

  6. Effect of plasma formation on electron pinching and microwave emission in a virtual cathode oscillator

    Energy Technology Data Exchange (ETDEWEB)

    Yatsuzuka, M; Nakayama, M; Nobuhara, S [Himeji Institute of Technology (Japan); Young, D; Ishihara, O [Texas Tech Univ., Lubbock, TX (United States)

    1997-12-31

    Time and spatial evolutions of anode and cathode plasmas in a vircator diode were observed with a streak camera. A cathode plasma appeared immediately after the rise of a beam current and was followed by an anode plasma typically after about 30 ns. Both plasmas expanded with almost the same speed of order of 104 m/s. The anode plasma was confirmed as a hydrogen plasma with an optical filter for H{sub {beta}} line and study of anode-temperature rise. Electron beam pinching immediately followed by microwave emission was observed at the beam current less than the critical current for diode pinching in the experiment and the simulation. The electron beam current in the diode region is well characterized by the electron space-charge-limited current in bipolar flow with the expanding plasmas between the anode-cathode gap. As a result, electron bombardment produced the anode plasma, which made the electron beam strongly pinched, resulting in virtual cathode formation and microwave emission. (author). 5 figs., 5 refs.

  7. Application of microwave air plasma in the destruction of trichloroethylene and carbon tetrachloride at atmospheric pressure.

    Science.gov (United States)

    Rubio, S J; Quintero, M C; Rodero, A

    2011-02-15

    In this study, the destruction rate of a volatile waste destruction system based on a microwave plasma torch operating at atmospheric pressure was investigated. Atmospheric air was used to maintain the plasma and was introduced by a compressor, which resulted in lower operating costs compared to other gases such as argon and helium. To isolate the output gases and control the plasma discharge atmosphere, the plasma was coupled to a reactor. The effect of the gas flow rate, microwave power and initial concentration of compound on the destruction efficiency of the system was evaluated. In this study, trichloroethylene and carbon tetrachloride were used as representative volatile organic compounds to determine the destruction rate of the system. Based on the experimental results, at an applied microwave power less than 1000 W, the proposed system can reduce input concentrations in the ppmv range to output concentrations at the ppbv level. High air flow rates and initial concentrations produced energy efficiency values greater than 1000 g/kW h. The output gases and species present in the plasma were analysed by gas chromatography and optical emission spectroscopy, respectively, and negligible amounts of halogenated compounds resulting from the cleavage of C(2)HCl(3) and CCl(4) were observed. The gaseous byproducts of decomposition consisted mainly of CO(2), NO and N(2)O, as well as trace amounts of Cl(2) and solid CuCl. Copyright © 2010 Elsevier B.V. All rights reserved.

  8. Application of microwave air plasma in the destruction of trichloroethylene and carbon tetrachloride at atmospheric pressure

    Energy Technology Data Exchange (ETDEWEB)

    Rubio, S.J., E-mail: f62rugas@uco.es [Departamento de Fisica, Campus de Rabanales, Edificio Einstein, Planta Baja, Universidad de Cordoba (Spain); Quintero, M.C.; Rodero, A. [Departamento de Fisica, Campus de Rabanales, Edificio Einstein, Planta Baja, Universidad de Cordoba (Spain)

    2011-02-15

    In this study, the destruction rate of a volatile waste destruction system based on a microwave plasma torch operating at atmospheric pressure was investigated. Atmospheric air was used to maintain the plasma and was introduced by a compressor, which resulted in lower operating costs compared to other gases such as argon and helium. To isolate the output gases and control the plasma discharge atmosphere, the plasma was coupled to a reactor. The effect of the gas flow rate, microwave power and initial concentration of compound on the destruction efficiency of the system was evaluated. In this study, trichloroethylene and carbon tetrachloride were used as representative volatile organic compounds to determine the destruction rate of the system. Based on the experimental results, at an applied microwave power less than 1000 W, the proposed system can reduce input concentrations in the ppmv range to output concentrations at the ppbv level. High air flow rates and initial concentrations produced energy efficiency values greater than 1000 g/kW h. The output gases and species present in the plasma were analysed by gas chromatography and optical emission spectroscopy, respectively, and negligible amounts of halogenated compounds resulting from the cleavage of C{sub 2}HCl{sub 3} and CCl{sub 4} were observed. The gaseous byproducts of decomposition consisted mainly of CO{sub 2}, NO and N{sub 2}O, as well as trace amounts of Cl{sub 2} and solid CuCl.

  9. Plasma generator utilizing dielectric member for carrying microwave energy

    International Nuclear Information System (INIS)

    Aklufi, M.E.; Brock, D.W.

    1991-01-01

    This patent describes a system in which electromagnetic energy is used to generate a plasma from a gas. It comprises a reaction chamber which is evacuated to less than ambient pressure and into which the gas is introduced; and a nonconductive member for carrying the electromagnetic energy and for emitting the electromagnetic energy so that a plasma is formed from the gas

  10. One-step microwave plasma enhanced chemical vapor deposition (MW-PECVD) for transparent superhydrophobic surface

    Science.gov (United States)

    Thongrom, Sukrit; Tirawanichakul, Yutthana; Munsit, Nantakan; Deangngam, Chalongrat

    2018-02-01

    We demonstrate a rapid and environmental friendly fabrication technique to produce optically clear superhydrophobic surfaces using poly (dimethylsiloxane) (PDMS) as a sole coating material. The inert PDMS chain is transformed into a 3-D irregular solid network through microwave plasma enhanced chemical vapor deposition (MW-PECVD) process. Thanks to high electron density in the microwave-activated plasma, coating can be done in just a single step with rapid deposition rate, typically much shorter than 10 s. Deposited layers show excellent superhydrophobic properties with water contact angles of ∼170° and roll-off angles as small as ∼3°. The plasma-deposited films can be ultrathin with thicknesses under 400 nm, greatly diminishing the optical loss. Moreover, with appropriate coating conditions, the coating layer can even enhance the transmission over the entire visible spectrum due to a partial anti-reflection effect.

  11. Spectroscopic study of atmospheric pressure 915 MHz microwave plasma at high argon flow rate

    International Nuclear Information System (INIS)

    Miotk, R; Hrycak, B; Jasinski, M; Mizeraczyk, J

    2012-01-01

    In this paper results of optical emission spectroscopic (OES) study of atmospheric pressure microwave 915 MHz argon plasma are presented. The plasma was generated in microwave plasma source (MPS) cavity-resonant type. The aim of research was determination of electron excitation temperature T exc gas temperature Tg and electron number density n e . All experimental tests were performed with a gas flow rate of 100 and 200 l/min and absorbed microwave power PA from 0.25 to 0.9 kW. The emission spectra at the range of 300 – 600 nm were recorded. Boltzmann plot method for argon 5p – 4s and 5d – 4p transition lines allowed to determine T exc at level of 7000 K. Gas temperature was determined by comparing the measured and simulated spectra using LIFBASE program and by analyzing intensities of two groups of unresolved rotational lines of the OH band. Gas temperature ranged 600 – 800 K. The electron number density was determined using the method based on the Stark broadening of hydrogen H β line. The measured n e rang ed 2 × 10 15 − 3.5×10 15 cm −3 , depending on the absorbed microwave power. The described MPS works very stable with various working gases at high flow rates, that makes it an attractive tool for different gas processing.

  12. Design and construction the identification of nitriding plasma process parameters using personal computer based on serial communication

    International Nuclear Information System (INIS)

    Frida Iswinning Diah; Slamet Santosa

    2012-01-01

    Design and construction the identification of process parameters using personal computer based on serial communication PLC M-series has been done. The function of this device is to identify the process parameters of a system (plan), to which then be analyzed and conducted a follow-up given to the plan by the user. The main component of this device is the M-Series T100MD1616 PLC and personal computer (PC). In this device the data plan parameters obtained from the corresponding sensor outputs in the form of voltage or current. While the analog parameter data is adjusted to the ADC analog input of the PLC using a signal conditioning system. Then, as the parameter is processed by the PLC then sent to a PC via RS232 to be displayed in the form of graphs or tables and stored in the database. Software to program the database is created using Visual Basic Programming V-6. The device operation test is performed for the measurement of temperature parameter and vacuum level on the plasma nitriding machine. The results indicate that the device has functioning as an identification device parameters process of plasma nitriding machine. (author)

  13. Equivalent circuit of a coaxial-line-based nozzleless microwave 915 MHz plasma source

    International Nuclear Information System (INIS)

    Miotk, R; Jasiński, M; Mizeraczyk, J

    2016-01-01

    This paper presents a new concept of an equivalent circuit of a microwave plasma source (MPS) used for gas treatment. The novelty of presented investigations is the use of the Weissfloch circuit as equivalent of an area of waveguide discontinuity in the MPS which is a result of entering a coaxial-line structure. Furthermore, in this area the microwave discharge is generated. Verification of the proposed method was carried out. The proposed equivalent circuit enabled calculating the MPS tuning characteristics and comparing them with those measured experimentally. This process allowed us to determine the impedance Z_P ofplasma in the MPS. (paper)

  14. Factors affecting the adhesion of microwave plasma deposited siloxane films on polycarbonate

    International Nuclear Information System (INIS)

    Muir, B.W.; Thissen, H.; Simon, G.P.; Murphy, P.J.; Griesser, H.J.

    2006-01-01

    The effects of a radiofrequency oxygen plasma pretreatment and residual water content in the substrate on the adhesion of microwave plasma deposited tetramethyldisiloxane thin films on Bisphenol-A polycarbonate (BPA-PC) were investigated. Samples were characterised using a crosshatch adhesion test, optical and electron microscopy, and X-ray photoelectron spectroscopy. It was found that the use of a low power (5 W) and low treatment time (0.1 s) oxygen plasma can improve adhesion while greater treatment times (1-30 s) and higher oxygen plasma powers (40 W) resulted in a decreased level of adhesion. In addition, it was shown that a BPA-PC water content greater than 90 ppm resulted in rapid adhesion failure of deposited films at the substrate-plasma polymer interface during outdoor weathering. All films degraded substantially when exposed to environmental weathering, indicating ageing reactions within the plasma polymer films themselves, and at the bulk polymer-coating interface

  15. Nonlinear phenomena in the interaction of microwaves with the low-temperature argon plasma flux

    International Nuclear Information System (INIS)

    Armand, N.A.; Lisitskaya, A.A.; Rogashkov, S.A.; Rogashkova, A.I.; Chmil', A.I.; Shustin, E.G.

    1982-01-01

    Theoretical and experimental investigations of nonlinear effects arising during the passing of SHF waves across an argon plasma jet flowing from an arc plasmatron have been carried on. It is shown that under conditions of the radiowave propagation through low temperature plasma moving across the direction of the wave propagation modes of both the wave self-focusing and its nonlinear asymmetrical refaction can be accomplished. The effect of the formation and propagation of the additional ionization region in a microwave flow initiated with plasma independently produced in the region of the maximum amplitude of the SHF field has been experimentally discovered [ru

  16. Microwave heating and diagnostic of suprathermal electrons in an overdense stellarator plasma

    International Nuclear Information System (INIS)

    Stange, Torsten

    2014-01-01

    The resonant coupling of microwaves into a magnetically confined plasma is one of the fundamental methods for the heating of such plasmas. Identifying and understanding the processes of the heating of overdense plasmas, in which the wave propagation is generally not possible because the wave frequency is below the plasma frequency, is becoming increasingly important for high density fusion plasmas. This work focuses on the heating of overdense plasmas in the WEGA stellarator. The excitation of electron Bernstein waves, utilizing the OXB-conversion process, provides a mechanism for the wave to reach the otherwise not accessible resonant absorption layer. In WEGA these OXB-heated plasmas exhibit a suprathermal electron component with energies up to 80 keV. The fast electrons are located in the plasma center and have a Maxwellian energy distribution function within the soft X-ray related energy range. The corresponding averaged energy is a few keV. The OXB-discharges are accompanied by a broadband microwave radiation spectrum with radiation temperatures of the order of keV. Its source was identified as a parametric decay of the heating wave and has no connection to the suprathermal electron component. For the detailed investigation of the microwave emission, a quasioptical mirror system, optimized for the OX-conversion, has been installed. Based on the measurement of the broadband microwave stray radiation of the decay process, the OX-conversion efficiency has been determined to 0.56 being in good agreement with full-wave calculations. In plasmas without an electron cyclotron resonance, corresponding to the wave frequency used, non-resonant heating mechanisms have been identified in the overdense plasma regions. Whistler waves or R-like waves are the only propagable wave types within the overdense plasmas. The analysis of the heating efficiency in dependence on the magnetic flux density leads to tunneling as the most probable coupling mechanism. For the determination

  17. Spatially resolved emission spectroscopic investigation of microwave-induced reactive low-power plasma jets

    International Nuclear Information System (INIS)

    Arnold, Thomas; Grabovski, Sergey; Schindler, Axel; Wagner, Hans-Erich

    2004-01-01

    A microwave-induced Ar/SF 6 plasma jet is characterized by means of optical emission spectroscopy. Rotational temperatures from unresolved N 2 bands and excitation temperatures from Fe lines as well as electron densities (H β Stark broadening) have been estimated along the plasma jet axis using a side-on configuration. The SF 6 gas flow rate and chamber pressure were varied from 10 to 250 sccm and 20 to 500 mbar, respectively. Three characteristic jet regions have been observed: the plasma ignition zone, followed by the gas mixing zone and a relaxing zone

  18. Carbon dioxide elimination and regeneration of resources in a microwave plasma torch

    International Nuclear Information System (INIS)

    Uhm, Han S.; Kwak, Hyoung S.; Hong, Yong C.

    2016-01-01

    Carbon dioxide gas as a working gas produces a stable plasma-torch by making use of 2.45 GHz microwaves. The temperature of the torch flame is measured by making use of optical spectroscopy and a thermocouple device. Two distinctive regions are exhibited, a bright, whitish region of a high-temperature zone and a bluish, dimmer region of a relatively low-temperature zone. The bright, whitish region is a typical torch based on plasma species where an analytical investigation indicates dissociation of a substantial fraction of carbon dioxide molecules, forming carbon monoxides and oxygen atoms. The emission profiles of the oxygen atoms and the carbon monoxide molecules confirm the theoretical predictions of carbon dioxide disintegration in the torch. Various hydrocarbon materials may be introduced into the carbon dioxide torch, regenerating new resources and reducing carbon dioxide concentration in the torch. As an example, coal powders in the carbon dioxide torch are converted into carbon monoxide according to the reaction of CO_2 + C → 2CO, reducing a substantial amount of carbon dioxide concentration in the torch. In this regards, the microwave plasma torch may be one of the best ways of converting the carbon dioxides into useful new materials. - Highlights: • Carbon dioxide gas produces a plasma-torch by making use of 2.45 GHz microwaves. • The temperature measurement of torch flame by optical spectroscopy. • Disintegration of carbon dioxide into carbon monoxide and oxygen atom. • Emission profiles of carbon monoxide confirm disintegration theory. • Conversion of carbon dioxide into carbon monoxide in the plasma torch. - This article presents carbon-dioxide plasma torch operated by microwaves and its applications to regeneration of new resources, eliminating carbon dioxide molecules.

  19. Recent results of studies of plasma fluctuations in stellarators by microwave scattering technique

    International Nuclear Information System (INIS)

    Skvortsova, N.N.; Batanov, G.M.; Kolik, L.V.; Petrov, A.E.; Pshenichnikov, A.A.; Sarksyan, K.A.; Kharchev, N.K.; Khol'nov, Yu.V.; Kubo, S.; Sanchez, J.

    2005-01-01

    Microwave scattering diagnostics are described that allow direct measurements of the turbulent processes in a high-temperature plasma of magnetic confinement systems. Plasma density fluctuations in the heating region of the L-2M stellarator were measured from microwave scattering at the fundamental and the second harmonics of the heating gyrotron radiation. In the TJ-II stellarator, a separate 2-mm microwave source was used to produce a probing beam; the measurements were performed at the middle of the plasma radius. Plasma density fluctuations in the axial (heating) region of the LHD stellarator were measured from microwave scattering at the fundamental harmonic of the heating gyrotron radiation. Characteristic features of fluctuations, common for all three devices, are revealed with the methods of statistical and spectral analysis. These features are the wide frequency Fourier and wavelet spectra, autocorrelation functions with slowly decreasing tails, and non-Gaussian probability distributions of the magnitudes and the increments of the magnitude of fluctuations. The drift-dissipative instability and the instability driven by trapped electrons are examined as possible sources of turbulence in a high-temperature plasma. Observations showed the high level of coherence between turbulent fluctuations in the central region and at the edge of the plasma in L-2M. It is shown in L-2M that the relative intensity of the second harmonic of gyrotron radiation on the axis of a microwave beam after quasi-optical filtering in a four-mirror quasi-optical transmission line is about -50 dB of the total radiation intensity. Spatiotemporal structures in plasma density fluctuations were observed in the central region of the plasma column. The correlation time between the structures was found to be on the order of 1 ms. It is shown that, the spectrum of the signal from the second-harmonic scattering extends to higher frequencies in comparison with that from the fundamental

  20. Microwave induced plasma for solid fuels and waste processing: A review on affecting factors and performance criteria.

    Science.gov (United States)

    Ho, Guan Sem; Faizal, Hasan Mohd; Ani, Farid Nasir

    2017-11-01

    High temperature thermal plasma has a major drawback which consumes high energy. Therefore, non-thermal plasma which uses comparatively lower energy, for instance, microwave plasma is more attractive to be applied in gasification process. Microwave-induced plasma gasification also carries the advantages in terms of simplicity, compactness, lightweight, uniform heating and the ability to operate under atmospheric pressure that gains attention from researchers. The present paper synthesizes the current knowledge available for microwave plasma gasification on solid fuels and waste, specifically on affecting parameters and their performance. The review starts with a brief outline on microwave plasma setup in general, and followed by the effect of various operating parameters on resulting output. Operating parameters including fuel characteristics, fuel injection position, microwave power, addition of steam, oxygen/fuel ratio and plasma working gas flow rate are discussed along with several performance criteria such as resulting syngas composition, efficiency, carbon conversion, and hydrogen production rate. Based on the present review, fuel retention time is found to be the key parameter that influences the gasification performance. Therefore, emphasis on retention time is necessary in order to improve the performance of microwave plasma gasification of solid fuels and wastes. Copyright © 2017 Elsevier Ltd. All rights reserved.

  1. Synthesis of aluminum nitride films by plasma immersion ion implantation-deposition using hybrid gas-metal cathodic arc gun

    International Nuclear Information System (INIS)

    Shen Liru; Fu, Ricky K.Y.; Chu, Paul K.

    2004-01-01

    Aluminum nitride (AlN) is of interest in the industry because of its excellent electronic, optical, acoustic, thermal, and mechanical properties. In this work, aluminum nitride films are deposited on silicon wafers (100) by metal plasma immersion ion implantation and deposition (PIIID) using a modified hybrid gas-metal cathodic arc plasma source and with no intentional heating to the substrate. The mixed metal and gaseous plasma is generated by feeding the gas into the arc discharge region. The deposition rate is found to mainly depend on the Al ion flux from the cathodic arc source and is only slightly affected by the N 2 flow rate. The AlN films fabricated by this method exhibit a cubic crystalline microstructure with stable and low internal stress. The surface of the AlN films is quite smooth with the surface roughness on the order of 1/2 nm as determined by atomic force microscopy, homogeneous, and continuous, and the dense granular microstructures give rise to good adhesion with the substrate. The N to Al ratio increases with the bias voltage applied to the substrates. A fairly large amount of O originating from the residual vacuum is found in the samples with low N:Al ratios, but a high bias reduces the oxygen concentration. The compositions, microstructures and crystal states of the deposited films are quite stable and remain unchanged after annealing at 800 deg. C for 1 h. Our hybrid gas-metal source cathodic arc source delivers better AlN thin films than conventional PIIID employing dual plasmas

  2. Abatement of fluorinated compounds using a 2.45 GHz microwave plasma torch with a reverse vortex plasma reactor

    Energy Technology Data Exchange (ETDEWEB)

    Kim, J.H.; Cho, C.H.; Shin, D.H. [Plasma Technology Research Center, National Fusion Research Institute, 814-2 Oxikdo-dong, Gunsan-city, Jeollabuk-do (Korea, Republic of); Hong, Y.C., E-mail: ychong@nfri.re.kr [Plasma Technology Research Center, National Fusion Research Institute, 814-2 Oxikdo-dong, Gunsan-city, Jeollabuk-do (Korea, Republic of); Shin, Y.W. [Plasma Technology Research Center, National Fusion Research Institute, 814-2 Oxikdo-dong, Gunsan-city, Jeollabuk-do (Korea, Republic of); School of Advanced Green Energy and Environments, Handong Global University, Heunghae-eup, Buk-gu, Pohang-city, Gyeongbuk (Korea, Republic of)

    2015-08-30

    Highlights: • We developed a microwave plasma torch with reverse vortex reactor (RVR). • We calculated a volume fraction and temperature distribution of discharge gas and waste. • The performance of reverse vortex reactor increased from 29% to 43% than conventional vortex reactor. - Abstract: Abatement of fluorinated compounds (FCs) used in semiconductor and display industries has received an attention due to the increasingly stricter regulation on their emission. We have developed a 2.45 GHz microwave plasma torch with reverse vortex reactor (RVR). In order to design a reverse vortex plasma reactor, we calculated a volume fraction and temperature distribution of discharge gas and waste gas in RVR by ANSYS CFX of computational fluid dynamics (CFD) simulation code. Abatement experiments have been performed with respect to SF{sub 6}, NF{sub 3} by varying plasma power and N{sub 2} flow rates, and FCs concentration. Detailed experiments were conducted on the abatement of NF{sub 3} and SF{sub 6} in terms of destruction and removal efficiency (DRE) using Fourier transform infrared (FTIR). The DRE of 99.9% for NF{sub 3} was achieved without an additive gas at the N{sub 2} flow rate of 150 liter per minute (L/min) by applying a microwave power of 6 kW with RVR. Also, a DRE of SF{sub 6} was 99.99% at the N{sub 2} flow rate of 60 L/min using an applied microwave power of 6 kW. The performance of reverse vortex reactor increased about 43% of NF{sub 3} and 29% of SF{sub 6} abatements results definition by decomposition energy per liter more than conventional vortex reactor.

  3. Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber.

    Science.gov (United States)

    Dechana, A; Thamboon, P; Boonyawan, D

    2014-10-01

    A microwave remote Plasma Enhanced-Atomic Layer Deposition system with multicusp confinement chamber is established at the Plasma and Beam Physics research facilities, Chiang Mai, Thailand. The system produces highly-reactive plasma species in order to enhance the deposition process of thin films. The addition of the multicusp magnetic fields further improves the plasma density and uniformity in the reaction chamber. Thus, the system is more favorable to temperature-sensitive substrates when heating becomes unwanted. Furthermore, the remote-plasma feature, which is generated via microwave power source, offers tunability of the plasma properties separately from the process. As a result, the system provides high flexibility in choice of materials and design experiments, particularly for low-temperature applications. Performance evaluations of the system were carried on coating experiments of Al2O3 layers onto a silicon wafer. The plasma characteristics in the chamber will be described. The resulted Al2O3 films-analyzed by Rutherford Backscattering Spectrometry in channeling mode and by X-ray Photoelectron Spectroscopy techniques-will be discussed.

  4. Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber

    Energy Technology Data Exchange (ETDEWEB)

    Dechana, A. [Program of Physics and General Science, Faculty of Science and Technology, Songkhla Rajabhat University, Songkhla 90000 (Thailand); Thamboon, P. [Science and Technology Research Institute, Chiang Mai University, Chiang Mai 50200 (Thailand); Boonyawan, D., E-mail: dheerawan.b@cmu.ac.th [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand)

    2014-10-15

    A microwave remote Plasma Enhanced-Atomic Layer Deposition system with multicusp confinement chamber is established at the Plasma and Beam Physics research facilities, Chiang Mai, Thailand. The system produces highly-reactive plasma species in order to enhance the deposition process of thin films. The addition of the multicusp magnetic fields further improves the plasma density and uniformity in the reaction chamber. Thus, the system is more favorable to temperature-sensitive substrates when heating becomes unwanted. Furthermore, the remote-plasma feature, which is generated via microwave power source, offers tunability of the plasma properties separately from the process. As a result, the system provides high flexibility in choice of materials and design experiments, particularly for low-temperature applications. Performance evaluations of the system were carried on coating experiments of Al{sub 2}O{sub 3} layers onto a silicon wafer. The plasma characteristics in the chamber will be described. The resulted Al{sub 2}O{sub 3} films—analyzed by Rutherford Backscattering Spectrometry in channeling mode and by X-ray Photoelectron Spectroscopy techniques—will be discussed.

  5. Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber

    Science.gov (United States)

    Dechana, A.; Thamboon, P.; Boonyawan, D.

    2014-10-01

    A microwave remote Plasma Enhanced-Atomic Layer Deposition system with multicusp confinement chamber is established at the Plasma and Beam Physics research facilities, Chiang Mai, Thailand. The system produces highly-reactive plasma species in order to enhance the deposition process of thin films. The addition of the multicusp magnetic fields further improves the plasma density and uniformity in the reaction chamber. Thus, the system is more favorable to temperature-sensitive substrates when heating becomes unwanted. Furthermore, the remote-plasma feature, which is generated via microwave power source, offers tunability of the plasma properties separately from the process. As a result, the system provides high flexibility in choice of materials and design experiments, particularly for low-temperature applications. Performance evaluations of the system were carried on coating experiments of Al2O3 layers onto a silicon wafer. The plasma characteristics in the chamber will be described. The resulted Al2O3 films—analyzed by Rutherford Backscattering Spectrometry in channeling mode and by X-ray Photoelectron Spectroscopy techniques—will be discussed.

  6. Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber

    International Nuclear Information System (INIS)

    Dechana, A.; Thamboon, P.; Boonyawan, D.

    2014-01-01

    A microwave remote Plasma Enhanced-Atomic Layer Deposition system with multicusp confinement chamber is established at the Plasma and Beam Physics research facilities, Chiang Mai, Thailand. The system produces highly-reactive plasma species in order to enhance the deposition process of thin films. The addition of the multicusp magnetic fields further improves the plasma density and uniformity in the reaction chamber. Thus, the system is more favorable to temperature-sensitive substrates when heating becomes unwanted. Furthermore, the remote-plasma feature, which is generated via microwave power source, offers tunability of the plasma properties separately from the process. As a result, the system provides high flexibility in choice of materials and design experiments, particularly for low-temperature applications. Performance evaluations of the system were carried on coating experiments of Al 2 O 3 layers onto a silicon wafer. The plasma characteristics in the chamber will be described. The resulted Al 2 O 3 films—analyzed by Rutherford Backscattering Spectrometry in channeling mode and by X-ray Photoelectron Spectroscopy techniques—will be discussed

  7. Characterization of surface hardening in a nitrated chromium steel by microwave plasma type ECR (Electron Cyclotron Resonance)

    International Nuclear Information System (INIS)

    La O C, G. de.

    1995-01-01

    With this work it is demonstrated the possibility of performing the nitriding process by using a CVD-ECR source, based on the results obtained after treating several samples of AISI H-12 steel. Also, the main operating parameters (time of treatment, sample temperatures and gas mixture) are determined during nitriding of this steel with the mentioned source. Samples used before nitriding were quenched and tempered at 580 Centigrade degrees. Several experiments were done by using a pure nitrogen plasma with exposure times of the samples of 20 minutes at temperatures from 450 to 550 Centigrade degrees, and by using a N 2 - H 2 plasma with exposure times of the samples of 20, 30 and 40 minutes at temperatures from 350 to 550 Centigrade degrees. Metallography, microhardness, EDS and Auger analysis were done to observe changes suffered for the samples after treatment. (Author)

  8. The Influence of Plasma-Based Nitriding and Oxidizing Treatments on the Mechanical and Corrosion Properties of CoCrMo Biomedical Alloy

    Science.gov (United States)

    Noli, Fotini; Pichon, Luc; Öztürk, Orhan

    2018-04-01

    Plasma-based nitriding and/or oxidizing treatments were applied to CoCrMo alloy to improve its surface mechanical properties and corrosion resistance for biomedical applications. Three treatments were performed. A set of CoCrMo samples has been subjected to nitriding at moderate temperatures ( 400 °C). A second set of CoCrMo samples was oxidized at 395 °C in pure O2. The last set of CoCrMo samples was nitrided and subsequently oxidized under the experimental conditions of previous sets (double treatment). The microstructure and morphology of the layers formed on the CoCrMo alloy were investigated by X-ray diffraction, Atomic Force Microscopy, and Scanning Electron Microscopy. In addition, nitrogen and oxygen profiles were determined by Glow Discharge Optical Emission Spectroscopy, Rutherford Backscattering Spectroscopy, Energy-Dispersive X-ray, and Nuclear Reaction Analysis. Significant improvement of the Vickers hardness of the CoCrMo samples after plasma nitriding was observed due to the supersaturated nitrogen solution and the formation of an expanded FCC γ N phase and CrN precipitates. In the case of the oxidized samples, Vickers hardness improvement was minimal. The corrosion behavior of the samples was investigated in simulated body fluid (0.9 pct NaCl solution at 37 °C) using electrochemical techniques (potentiodynamic polarization and cyclic voltammetry). The concentration of metal ions released from the CoCrMo surfaces was determined by Instrumental Neutron Activation Analysis. The experimental results clearly indicate that the CoCrMo surface subjected to the double surface treatment consisting in plasma nitriding and plasma oxidizing exhibited lower deterioration and better resistance to corrosion compared to the nitrided, oxidized, and untreated samples. This enhancement is believed to be due to the formation of a thicker and more stable layer.

  9. Microwave plasma-enhanced chemical vapour deposition growth of carbon nanostructures

    Directory of Open Access Journals (Sweden)

    Shivan R. Singh

    2010-05-01

    Full Text Available The effect of various input parameters on the production of carbon nanostructures using a simple microwave plasma-enhanced chemical vapour deposition technique has been investigated. The technique utilises a conventional microwave oven as the microwave energy source. The developed apparatus is inexpensive and easy to install and is suitable for use as a carbon nanostructure source for potential laboratory-based research of the bulk properties of carbon nanostructures. A result of this investigation is the reproducibility of specific nanostructures with the variation of input parameters, such as carbon-containing precursor and support gas flow rate. It was shown that the yield and quality of the carbon products is directly controlled by input parameters. Transmission electron microscopy and scanning electron microscopy were used to analyse the carbon products; these were found to be amorphous, nanotubes and onion-like nanostructures.

  10. A Reconfigurable Metal-Plasma Yagi-Yuda Antenna for Microwave Applications

    Directory of Open Access Journals (Sweden)

    Giulia Mansutti

    2017-05-01

    Full Text Available This paper is an extension of the work originally presented at the European Microwave Conference (EuMC about a reconfigurable hybrid metal-plasma Yagi-Uda antenna operating at 1.55 GHz: this antenna consists of metallic reflector and active element and two plasma directors. The conference work showed through full-wave numerical simulations (CST Microwave Studio how it is possible to achieve reconfigurability with respect to the gain by turning on/off the plasma discharges. However the model that was used to represent the plasma discharges was quite ideal, so one comment that was provided questioned the actual possibility of achieving reconfigurability in a real system. Consequently we performed extensive measurements of different plasma discharges and thanks to the collected data, we noticed some important differences between the full-wave numerical model of the plasma that we used in the conference paper and the actual plasma discharges that were generated in the experimental setup: the dielectric vessel and the metallic electrodes used respectively to confine and generate the plasma have an influence on the radiation pattern of the antenna and so they must be included in the design procedure; the cylindrical plasma discharge is much easier to realize when the cylinder diameter is at least 3mm; and finally the collision frequency of the plasma in realistic cases is pretty higher than the one adopted in our previous work. Therefore this work presents a feasibility study of a more detailed and realistic model of our antenna with respect to the plasma discharges. We will show that reconfigurability can still be achieved through a proper design of the overall antenna, thus paving the way to an actual realization of the proposed reconfigurable Yagi-Uda.

  11. Electrical Characteristics of Carbon Nanotubes by Plasma and Microwave Surface Treatments

    Energy Technology Data Exchange (ETDEWEB)

    Cho, Sangjin; Lee, Soonbo; Boo, Jinhyo [Sungkyunkwan Univ., Suwon (Korea, Republic of); Shrestha, Shankar Prasad [Tribhuvan Univ., Kathmandu (Nepal)

    2014-03-15

    The plasma and microwave surface treatments of carbon nanotubes that loaded on plastic substrates were carried out with expecting a change of carbon nanotube dispersion by increasing treatment time. The microwave treatment process was undergone by commercial microwave oven (800 W). The electrical property was measured by hall measurement and resistance was increased by increasing O{sub 2} flow rate of plasma, suggesting an improvement of carbon nanotube dispersion and a possibility of controlling the resistances of carbon nanotubes by plasma surface treatment. The resistance was increased in both polyethylene terephthalate and polyimide substrates by increasing O{sub 2} flow rate. Resistance changes only slightly with different O{sub 2} flow treatment in measure rho for all polyimide samples. Sheet resistance is lowest in polyimide substrate not due to high carbon nanotube loading but due to tendency to remain in elongated structure. O{sub 2} or N{sub 2} plasma treatments on both polyethylene terephthalate and polyimide substrates lead to increase in sheet resistance.

  12. Intense microwave pulse propagation through gas breakdown plasmas in a waveguide

    International Nuclear Information System (INIS)

    Byrne, D.P.

    1986-01-01

    High-power microwave pulse-compression techniques are used to generate 2.856 GHz pulses which are propagated in a TE 10 mode through a gas filled section of waveguide, where the pulses interact with self-generated gas-breakdown plasmas. Pulse envelopes transmitted through the plasmas, with duration varying from 2 ns to greater than 1 μs, and peak powers of a few kW to nearly 100 MW, are measured as a function of incident pulse and gas pressure for air, nitrogen, and helium. In addition, the spatial and temporal development of the optical radiation emitted by the breakdown plasmas are measured. For transmitted pulse durations ≥ 100 ns, good agreement is found with both theory and existing measurements. For transmitted pulse duration as short as 2 ns (less than 10 rf cycles), a two-dimensional model is used in which the electrons in the plasma are treated as a fluid whose interactions with the microwave pulse are governed by a self-consistent set of fluid equations and Maxwell's equations for the electromagnetic field. The predictions of this model for air are compared with the experimental results over a pressure range of 0.8 torr to 300 torr. Good agreement is obtained above about 1 torr pressure, demonstrating that microwave pulse propagation above the breakdown threshold can be accurately modeled on this time scale. 63 refs., 44 figs., 2 tabs

  13. Impedance Mismatch study between the Microwave Generator and the PUPR Plasma Machine

    International Nuclear Information System (INIS)

    Gaudier, Jorge R.; Castellanos, Ligeia; Encarnacion, Kabir; Zavala, Natyaliz; Rivera, Ramon; Farahat, Nader; Leal, Edberto

    2006-01-01

    Impedance mismatch inside the connection from the microwave power generator to the plasma machine is studied. A magnetron power generator transmits microwaves of 2.45 GHz and variable power from 50W to 5000W, through a flexible rectangular waveguide to heat plasma inside a Mirror Cusp devise located at the Polytechnic University of Puerto Rico. Before the production of plasma, the residual gas of the devise must be extracted by a vacuum system (5Torr or better), then Argon gas is injected to the machine. The microwaves heat the Argon ions to initiate ionization and plasma is produced. A dielectric wall is used inside the rectangular waveguide to isolate the plasma machine and maintain vacuum. Even though the dielectric will not block the wave propagation, some absorption of microwaves will occur. This absorption will cause reflection, reducing the efficiency of the power transfer. Typically a thin layer of Teflon is used, but measurements using this dielectric show a significant reflection of power back to the generator. Due to the high-power nature of the generator (5KW), this mismatch is not desirable. An electromagnetic field solver based on the Finite Difference Time Domain Method(FDTD) is used to model the rectangular waveguide connection. The characteristic impedance of the simulation is compared with the analytical formula expression and a good agreement is obtain. Furthermore the Teflon-loaded guide is modeled using the above program and the input impedance is computed. The reflection coefficient is calculated based on the transmission line theory with the characteristic and input impedances. Based on the simulation results it is possible to optimize the thickness, shape and dielectric constant of the material, in order to seal the connection with a better match

  14. Microwave Plasma Synthesis of Materials—From Physics and Chemistry to Nanoparticles: A Materials Scientist’s Viewpoint

    Directory of Open Access Journals (Sweden)

    Dorothée Vinga Szabó

    2014-08-01

    Full Text Available In this review, microwave plasma gas-phase synthesis of inorganic materials and material groups is discussed from the application-oriented perspective of a materials scientist: why and how microwave plasmas are applied for the synthesis of materials? First, key players in this research field will be identified, and a brief overview on publication history on this topic is given. The fundamental basics, necessary to understand the processes ongoing in particle synthesis—one of the main applications of microwave plasma processes—and the influence of the relevant experimental parameters on the resulting particles and their properties will be addressed. The benefit of using microwave plasma instead of conventional gas phase processes with respect to chemical reactivity and crystallite nucleation will be reviewed. The criteria, how to choose an appropriate precursor to synthesize a specific material with an intended application is discussed. A tabular overview on all type of materials synthesized in microwave plasmas and other plasma methods will be given, including relevant citations. Finally, property examples of three groups of nanomaterials synthesized with microwave plasma methods, bare Fe2O3 nanoparticles, different core/shell ceramic/organic shell nanoparticles, and Sn-based nanocomposites, will be described exemplarily, comprising perspectives of applications.

  15. Modelling of microwave sustained capillary plasma columns at atmospheric pressure

    International Nuclear Information System (INIS)

    Pencheva, M; Petrova, Ts; Benova, E; Zhelyazkov, I

    2006-01-01

    In this work we present a model of argon microwave sustained discharge at high pressure (1 atm), which includes two self-consistently linked parts - electrodynamic and kinetic ones. The model is based on a steady-state Boltzmann equation in an effective field approximation coupled with a collisional-radiative model for high-pressure argon discharge numerically solved together with Maxwell's equation for an azimuthally symmetric TM surface wave and wave energy balance equation. It is applied for the purpose of theoretical description of the discharge in a stationary state. The phase diagram, the electron energy distribution function as well as the dependences of the electron and heavy particles densities and the mean input power per electron on the electron number density and wave number are presented

  16. Characteristics of an Electron Cyclotron Resonance Plasma Source for the Production of Active Nitrogen Species in III-V Nitride Epitaxy

    Science.gov (United States)

    Meyyappan, Meyya; Arnold, James O. (Technical Monitor)

    1997-01-01

    A simple analysis is provided to determine the characteristics of an electron cyclotron resonance (ECR) plasma source for the generation of active nitrogen species in the molecular beam epitaxy of III-V nitrides. The effects of reactor geometry, pressure, power, and flow rate on the dissociation efficiency and ion flux are presented. Pulsing the input power is proposed to reduce the ion flux.

  17. On the S-phase formation and the balanced plasma nitriding of austenitic-ferritic super duplex stainless steel

    Science.gov (United States)

    de Oliveira, Willian R.; Kurelo, Bruna C. E. S.; Ditzel, Dair G.; Serbena, Francisco C.; Foerster, Carlos E.; de Souza, Gelson B.

    2018-03-01

    The different physical responses of austenite (γ) and ferrite (α) iron structures upon nitriding result in technical challenges to the uniform modification of α-γ materials, as the super duplex stainless steel (SDSS). The effects of voltage (7-10 kV), frequency and pulse width on the nitrogen plasma immersion ion implantation of SDSS (α ∼ 56%, γ ∼ 44%) were investigated, correlated with structural, morphological and mechanical analyses. By controlling the treatment power, temperatures ranged from 292 °C to 401 °C. Despite the overall increase in hardness for any of the employed parameters (from ∼6 GPa to ∼15 GPa), the structure of individual grains was strikingly dissimilar at the same temperatures, depending on the energetic conditions of implantation. Modified-α grains containing iron nitrides (ε-Fe2-3N, γ‧ -Fe4N) presented intense brittleness, whereas the expanded phase γN (S-phase) laid principally in modified-γ grains, exhibiting ductile-like deformation features and thicker layers. The γN was the dominant phase in both α-γ grains at ∼401 °C, providing them with balanced structure and mechanical behavior. These phenomena corroborate with γN as mediator of the process, through a mechanism involving the nitrogen-promoted ferrite to austenite conversion and nitrides dissolution at high temperatures. An approximately linear correlation of the γN content with respect to the ion energy per pulse was demonstrated, which properly embodies limiting effects to the treatment. This can be a parameter for the α-γ steel surface modification, consisting in a better adjustment to obtain more precise control along with temperature.

  18. Determining the microwave coupling and operational efficiencies of a microwave plasma assisted chemical vapor deposition reactor under high pressure diamond synthesis operating conditions

    Energy Technology Data Exchange (ETDEWEB)

    Nad, Shreya [Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824 (United States); Department of Physics and Astronomy, Michigan State University, East Lansing, Michigan 48824 (United States); Gu, Yajun; Asmussen, Jes [Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824 (United States)

    2015-07-15

    The microwave coupling efficiency of the 2.45 GHz, microwave plasma assisted diamond synthesis process is investigated by experimentally measuring the performance of a specific single mode excited, internally tuned microwave plasma reactor. Plasma reactor coupling efficiencies (η) > 90% are achieved over the entire 100–260 Torr pressure range and 1.5–2.4 kW input power diamond synthesis regime. When operating at a specific experimental operating condition, small additional internal tuning adjustments can be made to achieve η > 98%. When the plasma reactor has low empty cavity losses, i.e., the empty cavity quality factor is >1500, then overall microwave discharge coupling efficiencies (η{sub coup}) of >94% can be achieved. A large, safe, and efficient experimental operating regime is identified. Both substrate hot spots and the formation of microwave plasmoids are eliminated when operating within this regime. This investigation suggests that both the reactor design and the reactor process operation must be considered when attempting to lower diamond synthesis electrical energy costs while still enabling a very versatile and flexible operation performance.

  19. Investigation and application of microwave electron cyclotron resonance plasma physical vapour deposition

    International Nuclear Information System (INIS)

    Ren Zhaoxing; Sheng Yanya; Shi Yicai; Wen Haihu; Cao Xiaowen

    1991-06-01

    The evaporating deposition of Ti film and Cu film by using microwave electron cyclotron resonance (ECR) technique was investigated. It deposition rate was about 50 nm/min and the temperature of the substrate was 50∼150 deg C. The thin amorphous films with strong adherent force were obtained. The sputtering deposition with ECR plasma was studied by employing higher plasma density and ionicity and negative substrate potential to make YBaCuO superconducting film. Its film was compact and amorphous with a thickness of 1.0 μm and the deposition rate was about 10 nm/min. The results show that this technique can initiate a high density and high ionicity plasma at lower gas pressure (10 -2 ∼10 -3 Pa). This plasma is the most suitable plasma source in thin film deposition process and surface treatment technique

  20. Germination of Chenopodium Album in Response to Microwave Plasma Treatment

    International Nuclear Information System (INIS)

    Sera, Bozena; Stranak, Vitezslav; Sery, Michal; Spatenka, Petr; Tichy, Milan

    2008-01-01

    The seeds of Lamb's Quarters (Chenopodium album agg.) were stimulated by low-pressure discharge. The tested seeds were exposed to plasma discharge for different time durations (from 6 minutes to 48 minutes). Germination tests were performed under specified laboratory conditions during seven days in five identical and completely independent experiments. Significant differences between the control and plasma-treated seeds were observed. The treated seeds showed structural changes on the surface of the seat coat. They germinated faster and their sprout accretion on the first day of seed germination was longer. Germination rate for the untreated seeds was 15% while it increased approximately three times (max 55%) for seeds treated by plasma from 12 minutes to 48 minutes.

  1. Frequency Upconversion and Parametric Surface Instabilities in Microwave Plasma Interactions.

    Science.gov (United States)

    Rappaport, Harold Lee

    In this thesis the interaction of radiation with plasmas whose density profiles are nearly step functions of space and/or time are studied. The wavelengths of radiation discussed are large compared with plasma density gradient scale lengths. The frequency spectra are evaluated and the energy balance investigated for the transmitted and reflected transient electromagnetic waves that are generated when a monochromatic source drives a finite width plasma in which a temporal step increase in density occurs. Transmission resonances associated with the abrupt boundaries manifest themselves as previously unreported multiple frequency peaks in the transmitted electromagnetic spectrum. A tunneling effect is described in which a burst of energy is transmitted from the plasma immediately following a temporal density transition. Stability of an abruptly bounded plasma, one for which the incident radiation wavelength is large compared with the plasma density gradient scale length, is investigated for both s and p polarized radiation types. For s-polarized radiation a new formalism is introduced in which pump induced perturbations are expressed as an explicit superposition of linear and non-linear plasma half-space modes. Results for a particular regime and a summary of relevant literature is presented. We conclude that when s-polarized radiation acts alone on an abrupt diffusely bounded underdense plasma stimulated excitation of electron surface modes is suppressed. For p-polarized radiation the recently proposed Lagrangian Frame Two-Plasmon Decay mode (LFTPD) ^dag is investigated in the regime in which the instability is not resonantly coupled to surface waves propagating along the boundary region. In this case, spatially dependent growth rate profiles and spatially dependent transit layer magnetic fields are reported. The regime is of interest because we have found that when the perturbation wavenumber parallel to the boundary is less than the pump frequency divided by twice

  2. Synthetic Aperture Microwave Imaging (SAMI) of the plasma edge on NSTX-U

    Science.gov (United States)

    Vann, Roddy; Taylor, Gary; Brunner, Jakob; Ellis, Bob; Thomas, David

    2016-10-01

    The Synthetic Aperture Microwave Imaging (SAMI) system is a unique phased-array microwave camera with a +/-40° field of view in both directions. It can image cut-off surfaces corresponding to frequencies in the range 10-34.5GHz; these surfaces are typically in the plasma edge. SAMI operates in two modes: either imaging thermal emission from the plasma (often modified by its interaction with the plasma edge e.g. via BXO mode conversion) or ``active probing'' i.e. injecting a broad beam at the plasma surface and imaging the reflected/back-scattered signal. SAMI was successfully pioneered on the Mega-Amp Spherical Tokamak (MAST) at Culham Centre for Fusion Energy. SAMI has now been installed and commissioned on the National Spherical Torus Experiment Upgrade (NSTX-U) at Princeton Plasma Physics Laboratory. The firmware has been upgraded to include real-time digital filtering, which enables continuous acquisition of the Doppler back-scattered active probing data. In this poster we shall present SAMI's analysis of the plasma edge on NSTX-U including measurements of the edge pitch angle on NSTX-U using SAMI's unique 2-D Doppler-backscattering capability.

  3. Spatio-temporal dynamics of a pulsed microwave argon plasma: ignition and afterglow

    International Nuclear Information System (INIS)

    Carbone, Emile; Sadeghi, Nader; Vos, Erik; Hübner, Simon; Van Veldhuizen, Eddie; Van Dijk, Jan; Nijdam, Sander; Kroesen, Gerrit

    2015-01-01

    In this paper, a detailed investigation of the spatio-temporal dynamics of a pulsed microwave plasma is presented. The plasma is ignited inside a dielectric tube in a repetitively pulsed regime at pressures ranging from 1 up to 100 mbar with pulse repetition frequencies from 200 Hz up to 500 kHz. Various diagnostic techniques are employed to obtain the main plasma parameters both spatially and with high temporal resolution. Thomson scattering is used to obtain the electron density and mean electron energy at fixed positions in the dielectric tube. The temporal evolution of the two resonant and two metastable argon 4s states are measured by laser diode absorption spectroscopy. Nanosecond time-resolved imaging of the discharge allows us to follow the spatio-temporal evolution of the discharge with high temporal and spatial resolution. Finally, the temporal evolution of argon 4p and higher states is measured by optical emission spectroscopy. The combination of these various diagnostics techniques gives deeper insight on the plasma dynamics during pulsed microwave plasma operation from low to high pressure regimes. The effects of the pulse repetition frequency on the plasma ignition dynamics are discussed and the plasma-off time is found to be the relevant parameter for the observed ignition modes. Depending on the delay between two plasma pulses, the dynamics of the ionization front are found to be changing dramatically. This is also reflected in the dynamics of the electron density and temperature and argon line emission from the plasma. On the other hand, the (quasi) steady state properties of the plasma are found to depend only weakly on the pulse repetition frequency and the afterglow kinetics present an uniform spatio-temporal behavior. However, compared to continuous operation, the time-averaged metastable and resonant state 4s densities are found to be significantly larger around a few kHz pulsing frequency. (paper)

  4. The relationship between cellular adhesion and surface roughness in polystyrene modified by microwave plasma radiation

    Directory of Open Access Journals (Sweden)

    Biazar E

    2011-03-01

    Full Text Available Esmaeil Biazar1, Majid Heidari2, Azadeh Asefnezhad2, Naser Montazeri11Department of Chemistry, Islamic Azad University, Tonekabon Branch, Mazandaran; 2Department of Biomaterial Engineering, Faculty of Biomedical Engineering, Science and Research Branch, Islamic Azad University, Tehran, IranBackground: Surface modification of medical polymers can improve biocompatibility. Pure polystyrene is hydrophobic and cannot provide a suitable environment for cell cultures. The conventional method for surface modification of polystyrene is treatment with plasma. In this study, conventional polystyrene was exposed to microwave plasma treatment with oxygen and argon gases for 30, 60, and 180 seconds.Methods and results: Attenuated total reflection Fourier transform infrared spectra investigations of irradiated samples indicated clearly the presence of functional groups. Atomic force microscopic images of samples irradiated with inert and active gases indicated nanometric surface topography. Samples irradiated with oxygen plasma showed more roughness (31 nm compared with those irradiated with inert plasma (16 nm at 180 seconds. Surface roughness increased with increasing duration of exposure, which could be due to reduction of the contact angle of samples irradiated with oxygen plasma. Contact angle analysis showed reduction in samples irradiated with inert plasma. Samples irradiated with oxygen plasma showed a lower contact angle compared with those irradiated by argon plasma.Conclusion: Cellular investigations with unrestricted somatic stem cells showed better adhesion, cell growth, and proliferation for samples radiated by oxygen plasma with increasing duration of exposure than those of normal samples.Keywords: surface topography, polystyrene, plasma treatment, argon, oxygen

  5. Surface modification and stability of detonation nanodiamonds in microwave gas discharge plasma

    International Nuclear Information System (INIS)

    Stanishevsky, Andrei V.; Walock, Michael J.; Catledge, Shane A.

    2015-01-01

    Graphical abstract: - Highlights: • Single and binary gas plasma modification of nanodiamond powders studied. • Temperature-dependent effect of N 2 and N 2 /H 2 plasma reported for the first time. • Role of H 2 in H 2 /N 2 and H 2 /O 2 plasma modification of nanodiamond discussed. - Abstract: Detonation nanodiamonds (DND), with low hydrogen content, were exposed to microwave plasma generated in pure H 2 , N 2 , and O 2 gases and their mixtures, and investigated using X-ray diffraction (XRD), Fourier Transform Infrared (FTIR), Raman, and X-ray photoelectron spectroscopies. Considerable alteration of the DND surface was observed under the plasma conditions for all used gases, but the diamond structure of the DND particle core was preserved in most cases. The stabilizing effect of H 2 in H 2 /N 2 and H 2 /O 2 binary gas plasmas on the DND structure and the temperature-dependent formation of various CNH x surface groups in N 2 and H 2 /N 2 plasmas were observed and discussed for the first time. DND surface oxidation and etching were the main effects of O 2 plasma, whereas the N 2 plasma led to DND surfaces rich in amide groups below 1073 K and nitrile groups at higher temperatures. Noticeable graphitization of the DND core structure was detected only in N 2 plasma when the substrate temperature was above 1103 K.

  6. Development of a multi-channel horn mixer array for microwave imaging plasma diagnostics

    International Nuclear Information System (INIS)

    Ito, Naoki; Kuwahara, Daisuke; Nagayama, Yoshio

    2015-01-01

    Microwave to millimeter-wave diagnostics techniques, such as interferometry, reflectometry, scattering, and radiometry, have been powerful tools for diagnosing magnetically confined plasmas. The resultant measurements have clarified several physics issues, including instability, wave phenomena, and fluctuation-induced transport. Electron cyclotron emission imaging has been an important tool in the investigation of temperature fluctuations, while reflectometry has been employed to measure plasma density profiles and their fluctuations. We have developed a horn-antenna mixer array (HMA), a 50 - 110 GHz 1D antenna array, which can be easily stacked as a 2D array. This article describes an upgrade to the horn mixer array that combines well-characterized mixers, waveguide-to-microstrip line transitions, intermediate frequency amplifiers, and internal local oscillator modules using a monolithic microwave integrated circuit technology to improve system performance. We also report on the use of a multi-channel HMA system. (author)

  7. Laser diagnostics of atomic hydrogen and oxygen production in rf and microwave plasma discharges

    International Nuclear Information System (INIS)

    Preppernau, B.L.

    1993-01-01

    The research for this thesis involved the application of two-photon allowed laser-induced fluorescence (TALIF) to the study of atomic hydrogen and oxygen production in industrial scale radio-frequency and microwave plasma discharge apparatus. Absolute atomic hydrogen concentration profiles were measured in a Gaseous Electronics Conference Reference Cell installed at Wright-Patterson AFB, Ohio operating with a simple H 2 discharge. Two-dimensional atomic hydrogen concentration profiles were also measured in an ASTEX HPMM microwave plasma diamond deposition reactor during actual diamond growth. In addition absolute atomic oxygen concentrations were measured in the ASTEX system. Particular attention as paid to refining the concentration calibration technique and in determining a correction to account for the collisional quenching of excited state fluorescence in high pressure gases

  8. MTX [Microwave Tokamak Experiment] diagnostic and auxiliary systems for confinement, transport, and plasma physics studies

    International Nuclear Information System (INIS)

    Hooper, E.B.; Allen, S.L.; Casper, T.A.; Thomassen, K.I.

    1989-01-01

    This note describes the diagnostics and auxiliary systems on the Microwave Tokamak Experiment (MTX) for confinement, transport, and other plasma physics studies. It is intended as a reference on the installed and planned hardware on the machine for those who need more familiarity with this equipment. Combined with the tokamak itself, these systems define the opportunities and capabilities for experiments in the MTX facility. We also illustrate how these instruments and equipment are to be used in carrying out the MTX Operations Plan. Near term goals for MTX are focussed on the absorption and heating by the microwave beam from the FEL, but the Plan also includes using the facility to study fundamental phenomena in the plasma, to control MHD activity, and to drive current noninductively

  9. Properties of hydrogenated amorphous silicon (a-Si:H) deposited using a microwave Ecr plasma

    International Nuclear Information System (INIS)

    Mejia H, J.A.

    1996-01-01

    Hydrogenated amorphous silicon (a-Si:H) films have been widely applied to semiconductor devices, such as thin film transistors, solar cells and photosensitive devices. In this work, the first Si-H-Cl alloys (obtained at the National Institute for Nuclear Research of Mexico) were formed by a microwave electron cyclotron resonance (Ecr) plasma CVD method. Gaseous mixtures of silicon tetrachloride (Si Cl 4 ), hydrogen and argon were used. The Ecr plasma was generated by microwaves at 2.45 GHz and a magnetic field of 670 G was applied to maintain the discharge after resonance condition (occurring at 875 G). Si and Cl contents were analyzed by Rutherford Backscattering Spectrometry (RBS). It was found that, increasing proportion of Si Cl 4 in the mixture or decreasing pressure, the silicon and chlorine percentages decrease. Optical gaps were obtained by spectrophotometry. Decreasing temperature, optical gap values increase from 1.4 to 1.5 eV. (Author)

  10. Microwave holography in a uniaxial anial anisotropic plasma

    International Nuclear Information System (INIS)

    Nagai, Keinosuke; Suzuki, Michio

    1974-01-01

    Properties of a hologram constructed in a uniaxial anisotropic medium, namely in a gyro-plasma were investigated theoretically. We considered the interference patterns of ordinary waves and extraordinary waves from a source such as a hologram. An element of permitivity tensor can be measured by the reconstruction process from this hologram. (auth.)

  11. Improved microwave shielding behavior of carbon nanotube-coated PET fabric using plasma technology

    Energy Technology Data Exchange (ETDEWEB)

    Haji, Aminoddin, E-mail: Ahaji@iaubir.ac.ir [Department of Textile Engineering, Birjand Branch, Islamic Azad University, Birjand (Iran, Islamic Republic of); Semnani Rahbar, Ruhollah [Department of Textile and Leather, Faculty of Chemistry and Petrochemical Engineering, Standard Research Institute, Karaj (Iran, Islamic Republic of); Mousavi Shoushtari, Ahmad [Textile Engineering Department, Amirkabir University of Technology, Tehran (Iran, Islamic Republic of)

    2014-08-30

    Four different procedures were conducted to load amine functionalized multiwall carbon nanotube (NH{sub 2}-MWCNT) onto poly (ethylene terephthalate) (PET) fabric surface to obtain a microwave shielding sample. Plasma treated fabric which was subsequently coated with NH{sub 2}-MWCNT in the presence of acrylic acid was chosen as the best sample. Surface changes in the PET fabrics were investigated by X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). Wide-angle X-ray diffraction was used to study the crystalline structure of the PET fabric. The microwave shielding performance of the PET fabrics in term of reflection loss was determined using a network analyzer at X-band (8.2–12.4 GHz). The XPS results revealed that the carbon atomic percentage decreased while the oxygen atomic percentage increased when the fabric was plasma treated and coated with NH{sub 2}-MWCNT. The SEM images showed that the NH{sub 2}-MWCNTs were homogenously dispersed and individually separated in the surface of fabric. Moreover, the structural studies showed that the crystalline region of the fabrics was not affected by NH{sub 2}-MWCNT and plasma treatment. The best microwave absorbing properties were obtained from the plasma treated fabric which was then coated with 10% NH{sub 2}-MWCNT in the presence of acrylic acid. It showed a minimum reflection loss of ∼−18.2 dB about 11 GHz. Proper attachments of NH{sub 2}-MWCNT on the PET fabric surface was explained in the suggested mechanism in which hydrogen bonding and amide linkage are responsible for the achievement of microwave shielding properties with high durability.

  12. Branched carbon nanofiber network synthesis at room temperature using radio frequency supported microwave plasmas

    OpenAIRE

    Boskovic, BO; Stolojan, V; Zeze, DA; Forrest, RD; Silva, SRP; Haq, S

    2004-01-01

    Carbon nanofibers have been grown at room temperature using a combination of radio frequency and microwave assisted plasma-enhanced chemical vapor deposition. The nanofibers were grown, using Ni powder catalyst, onto substrates kept at room temperature by using a purposely designed water-cooled sample holder. Branched carbon nanofiber growth was obtained without using a template resulting in interconnected carbon nanofiber network formation on substrates held at room temperatur...

  13. Improved microwave shielding behavior of carbon nanotube-coated PET fabric using plasma technology

    International Nuclear Information System (INIS)

    Haji, Aminoddin; Semnani Rahbar, Ruhollah; Mousavi Shoushtari, Ahmad

    2014-01-01

    Four different procedures were conducted to load amine functionalized multiwall carbon nanotube (NH 2 -MWCNT) onto poly (ethylene terephthalate) (PET) fabric surface to obtain a microwave shielding sample. Plasma treated fabric which was subsequently coated with NH 2 -MWCNT in the presence of acrylic acid was chosen as the best sample. Surface changes in the PET fabrics were investigated by X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). Wide-angle X-ray diffraction was used to study the crystalline structure of the PET fabric. The microwave shielding performance of the PET fabrics in term of reflection loss was determined using a network analyzer at X-band (8.2–12.4 GHz). The XPS results revealed that the carbon atomic percentage decreased while the oxygen atomic percentage increased when the fabric was plasma treated and coated with NH 2 -MWCNT. The SEM images showed that the NH 2 -MWCNTs were homogenously dispersed and individually separated in the surface of fabric. Moreover, the structural studies showed that the crystalline region of the fabrics was not affected by NH 2 -MWCNT and plasma treatment. The best microwave absorbing properties were obtained from the plasma treated fabric which was then coated with 10% NH 2 -MWCNT in the presence of acrylic acid. It showed a minimum reflection loss of ∼−18.2 dB about 11 GHz. Proper attachments of NH 2 -MWCNT on the PET fabric surface was explained in the suggested mechanism in which hydrogen bonding and amide linkage are responsible for the achievement of microwave shielding properties with high durability

  14. Plasma synthesis of titanium nitride, carbide and carbonitride nanoparticles by means of reactive anodic arc evaporation from solid titanium

    International Nuclear Information System (INIS)

    Kiesler, D.; Bastuck, T.; Theissmann, R.; Kruis, F. E.

    2015-01-01

    Plasma methods using the direct evaporation of a transition metal are well suited for the cost-efficient production of ceramic nanoparticles. In this paper, we report on the development of a simple setup for the production of titanium-ceramics by reactive anodic arc evaporation and the characterization of the aerosol as well as the nanopowder. It is the first report on TiC X N 1 − X synthesis in a simple anodic arc plasma. By means of extensive variations of the gas composition, it is shown that the composition of the particles can be tuned from titanium nitride over a titanium carbonitride phase (TiC X N 1 − X ) to titanium carbide as proven by XRD data. The composition of the plasma gas especially a very low concentration of hydrocarbons around 0.2 % of the total plasma gas is crucial to tune the composition and to avoid the formation of free carbon. Examination of the particles by HR-TEM shows that the material consists mostly of cubic single crystalline particles with mean sizes between 8 and 27 nm

  15. Dureza e resistência ao desgaste da camada de ZrN formada por nitretação a plasma sobre zircônia parcialmente estabilizada com ítria Hardness and wear resistance of the ZrN layer made by plasma nitriding of yttria partially-stabilized zirconia

    Directory of Open Access Journals (Sweden)

    R. Milani

    2010-07-01

    Full Text Available Corpos-de-prova de zircônia parcialmente estabilizada com ítria foram moldados por prensagem uniaxial, sinterizados e nitretados em plasma de micro-ondas à pressão atmosférica. A camada de ZrN sobre zircônia formou-se a uma taxa de 4 µm.min-1, podendo atingir uma espessura de 500 µm. As amostras foram caracterizadas por meio de medidas de dureza e resistência ao desgaste. A superfície nitretada apresentou dureza superior e resistência ao desgaste similar ao substrato de zircônia.Samples of yttria partially-stabilized zirconia were molded by uniaxial pressing, sintered and nitrided in an atmospheric pressure microwave plasma. This procedure leads to the formation of a ZrN layer whose growth rate and thickness reached 4 µm.min-1 and 500 µm, respectively. The samples were characterized by means of hardness and wear resistance tests. The nitrided surface exhibits superior hardness and wear resistance similar to that of the zirconia substrate.

  16. Hydrogen permeation modification of 4140 steel by ion nitriding with pulsed plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Bruzzoni, P.; Ortiz, M. [Comision Nacional de Energia Atomica, Buenos Aires (Argentina); Bruehl, S.P.; Gomez, B.J.A.; Feugeas, J.N. [Inst. de Fisica Rosario (UNR-CONICET), Rosario (Argentina); Nosei, L. [Inst. de Mecanica Aplicada y Estructuras (UNR), Rosario (Argentina)

    1998-11-10

    It is widely known that the hydrogen in steel produces embrittlement. This effect may cause the failure of the elements (confining walls, mechanical parts, etc.) whose surfaces are in contact with this gas or with processes in which hydrogen is continuously generated. In this work it is shown that the ion nitriding of the surface of AISI 4140 is a good mechanism to act as a barrier against hydrogen permeation in its bulk. The ion nitriding was performed using a square wave DC glow discharge. The development of a compound layer of iron nitrides was observed as the cause of the hydrogen permeation reduction. For equal duration of treatment, thicker compound layers were developed in higher discharge/post-discharge ratios in the square wave of the applied voltage onto the sample (cathode), with a greater reduction of hydrogen permeation coefficient as a consequence. Nevertheless, the permeation was not reduced to zero in any of the treatment conditions used. The results of the analysis of the permeation tests and the image of the photomicrographs showed that the existence of cracks, fractures, failures, etc. in the compound layer (pre-existing in the AISI 4140 steel) could be the cause of the residual hydrogen permeation. This can be attributed to the movement of the hydrogen through these defects diffusing through the original {alpha}-Fe phase of the non-treated steel. (orig.) 11 refs.

  17. Atomic hydrogen determination in medium-pressure microwave discharge hydrogen plasmas via emission actinometry

    International Nuclear Information System (INIS)

    Geng Zicai; Xu Yong; Yang Xuefeng; Wang Weiguo; Zhu Aimin

    2005-01-01

    Atomic hydrogen plays an important role in the chemical vapour deposition of functional materials, plasma etching and new approaches to the chemical synthesis of hydrogen-containing compounds. This work reports experimental determinations of atomic hydrogen in microwave discharge hydrogen plasmas formed from the TM 01 microwave mode in an ASTeX-type reactor, via optical emission spectroscopy using Ar as an actinometer. The relative intensities of the H atom Balmer lines and Ar-750.4 nm emissions as functions of input power and gas pressure have been investigated. At an input microwave power density of 13.5 W cm -3 , the approximate hydrogen dissociation fractions calculated from electron-impact excitation and quenching cross sections in the literature, decreased from ∼0.08 to ∼0.03 as the gas pressure was increased from 5 to 25 Torr. The influences of the above cross sections, and the electron and gas temperatures of the plasmas on the determination of the hydrogen dissociation fraction data have been discussed

  18. Production of hydrogen via methane reforming using atmospheric pressure microwave plasma

    Energy Technology Data Exchange (ETDEWEB)

    Jasinski, Mariusz; Dors, Miroslaw [Centre for Plasma and Laser Engineering, The Szewalski Institute of Fluid-Flow Machinery, Polish Academy of Sciences, Fiszera 14, 80-952 Gdansk (Poland); Mizeraczyk, Jerzy [Centre for Plasma and Laser Engineering, The Szewalski Institute of Fluid-Flow Machinery, Polish Academy of Sciences, Fiszera 14, 80-952 Gdansk (Poland); Department of Marine Electronics, Gdynia Maritime University, Morska 83, 81-225 Gdynia (Poland)

    2008-06-15

    In this paper, results of hydrogen production via methane reforming in the atmospheric pressure microwave plasma are presented. A waveguide-based nozzleless cylinder-type microwave plasma source (MPS) was used to convert methane into hydrogen. Important advantages of the presented waveguide-based nozzleless cylinder-type MPS are: stable operation in various gases (including air) at high flow rates, no need for a cooling system, and impedance matching. The plasma generation was stabilized by an additional swirled nitrogen flow (50 or 100 l min{sup -1}). The methane flow rate was up to 175 l min{sup -1}. The absorbed microwave power could be changed from 3000 to 5000 W. The hydrogen production rate and the corresponding energy efficiency in the presented methane reforming by the waveguide-based nozzleless cylinder-type MPS were up to 255 g[H{sub 2}] h{sup -1} and 85 g[H{sub 2}] kWh{sup -1}, respectively. These parameters are better than those typical of the conventional methods of hydrogen production (steam reforming of methane and water electrolysis). (author)

  19. Microwave Receivers for Fast-Ion Detection in Fusion Plasmas

    DEFF Research Database (Denmark)

    Furtula, Vedran

    for the frequency range from 100 to 110 GHz. In this thesis we follow the path of the radiation from a fusion plasma to the data acquisition unit. Firstly, the scattered radiation passes through the quasi-optical system. Quasi-optical elements required to be installed on the high field side (HFS) on the ITER...... are assessed. For the ITER HFS receiver we have designed and measured the quasioptical components that form a transmission link between the plasma and the radio frequency (RF) electronics. This HFS receiver is required to resolve the near parallel velocity components created by the alpha particles. Secondly...... is the mixer. The conversion loss of the mixer, together with loss in waveguide components and quasi-optic parts, is the main contributor to the noise and thereby degrades the signal to-noise ratio. The architecture of the mixer is a subharmonic type, optimized to be driven by a double local oscillator (LO...

  20. Optimization and analysis of shape of coaxial electrode for microwave plasma in water

    International Nuclear Information System (INIS)

    Hattori, Yoshiaki; Mukasa, Shinobu; Nomura, Shinfuku; Toyota, Hiromichi

    2010-01-01

    The effect of the shape of the electrode to generate 2.45 GHz microwave plasma in pure water is examined. Three variations of a common coaxial electrode are proposed, and compared according to the power required for plasma ignition and the position of plasma ignition in pure water at 6 kPa using a high-speed camera. These coaxial electrodes are calculated using three-dimensional finite-difference time-domain method calculations. The superior shape of coaxial electrode is found to be one with a flat plane on the tip of the inner electrode and dielectric substance located below the tip of the outer electrode. The position of the plasma ignition is related to the shape of the coaxial electrode. By solving the heat-conduction equation of water around the coaxial electrode taking into account the absorption of the microwave energy, the position of the plasma ignition is found to be not where electric field is the largest, but rather where temperature is maximized.

  1. Upper Hybrid Resonance of Microwaves with a Large Magnetized Plasma Sheet

    International Nuclear Information System (INIS)

    Huo Wenqing; Guo Shijie; Ding Liang; Xu Yuemin

    2013-01-01

    A large magnetized plasma sheet with size of 60 cm × 60 cm × 2 cm was generated by a linear hollow cathode discharge under the confinement of a uniform magnetic field generated by a Helmholtz Coil. The microwave transmission characteristic of the plasma sheet was measured for different incident frequencies, in cases with the electric field polarization of the incident microwave either perpendicular or parallel to the magnetic field. In this measurement, parameters of the plasma sheet were changed by varying the discharge current and magnetic field intensity. In the experiment, upper hybrid resonance phenomena were observed when the electric field polarization of the incident wave was perpendicular to the magnetic field. These resonance phenomena cannot be found in the case of parallel polarization incidence. This result is consistent with theoretical consideration. According to the resonance condition, the electron density values at the resonance points are calculated under various experimental conditions. This kind of resonance phenomena can be used to develop a specific method to diagnose the electron density of this magnetized plasma sheet apparatus. Moreover, it is pointed out that the operating parameters of the large plasma sheet in practical applications should be selected to keep away from the upper hybrid resonance point to prevent signals from polarization distortion

  2. Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers

    Energy Technology Data Exchange (ETDEWEB)

    Rampelberg, Geert; Devloo-Casier, Kilian; Deduytsche, Davy; Detavernier, Christophe [Department of Solid State Sciences, Ghent University, Krijgslaan 281/S1, B-9000 Ghent (Belgium); Schaekers, Marc [IMEC, Kapeldreef 75, B-3001 Leuven (Belgium); Blasco, Nicolas [Air Liquide Electronics US, L.P., 46401 Landing Parkway, Fremont, California 94538 (United States)

    2013-03-18

    Thin vanadium nitride (VN) layers were grown by atomic layer deposition using tetrakis(ethylmethylamino)vanadium and NH{sub 3} plasma at deposition temperatures between 70 Degree-Sign C and 150 Degree-Sign C on silicon substrates and polymer foil. X-ray photoelectron spectroscopy revealed a composition close to stoichiometric VN, while x-ray diffraction showed the {delta}-VN crystal structure. The resistivity was as low as 200 {mu}{Omega} cm for the as deposited films and further reduced to 143 {mu}{Omega} cm and 93 {mu}{Omega} cm by annealing in N{sub 2} and H{sub 2}/He/N{sub 2}, respectively. A 5 nm VN layer proved to be effective as a diffusion barrier for copper up to a temperature of 720 Degree-Sign C.

  3. Studies of the process of an unsteady formation of hard nitride coatings in an arc plasma flow

    International Nuclear Information System (INIS)

    Zake, M.

    1996-01-01

    The kinetic studies of an unsteady formation of hard ZrN and TiN coatings on the surface of metallic (Zr, Ti) samples in an Ar-N plasma flow are carried out. The obtained result is that at the initial stage of an unsteady heating of titanium samples nitrogen atoms penetrate into metal lattice and form interstitial compounds of hard nitrogen solutions in α-phase of Ti. This process is followed by a growth of thin surface layers of titanium nitrides with subsequent changes of surface radiance of exposed samples. Unsteady formation of ZrN is a similar two-stage process which includes the ZrN film growth and formation of a α-hard solution with subsequent changes of total normal emissivity of the surface. (author). 1 ref., 1 fig

  4. A Tutorial on Basic Principles of Microwave Reflectometry Applied to Fluctuation Measurements in Fusion Plasmas

    International Nuclear Information System (INIS)

    Nazikian, R.; Kramer, G.J.; Valeo, E.

    2001-01-01

    Microwave reflectometry is now routinely used for probing the structure of magnetohydrodynamic and turbulent fluctuations in fusion plasmas. Conditions specific to the core of tokamak plasmas, such as small amplitude of density irregularities and the uniformity of the background plasma, have enabled progress in the quantitative interpretation of reflectometer signals. In particular, the extent of applicability of the 1-D [one-dimensional] geometric optics description of the reflected field is investigated by direct comparison to 1-D full wave analysis. Significant advances in laboratory experiments are discussed which are paving the way towards a thorough understanding of this important measurement technique. Data is presented from the Tokamak Fusion Test Reactor [R. Hawryluk, Plasma Physics and Controlled Fusion 33 (1991) 1509] identifying the validity of the geometric optics description of the scattered field and demonstrating the feasibility of imaging turbulent fluctuations in fusion scale devices

  5. Plasma Diagnostics by Microwave Interferometry in MHD Channels with the Aid of an Open Waveguide

    Energy Technology Data Exchange (ETDEWEB)

    Muenkel, J. [Rheinische-Westfalische Technische Hochschule Aachen, Federal Republic of Germany (Germany)

    1966-10-15

    Plasma diagnostics of a novel kind, using microwave interferometry, is described. Use is made of an open non-conventional waveguide in the test path of the microwave bridge. Guiding the microwave has several advantages over free transmission of the test h.f. beam between two horn antennas if there are small plasma streams bounded by ceramics and metals as in the case of MHD channels. There are less unknown and uncontrolled disturbances of the electromagnetic waves introduced by the boundaries. On the other hand most guiding structures disturb the homogeneity of the streaming plasma (cf. arrangements with Lecher wires, dielectric rods, etc.); the waveguide used here does not do so. This waveguide, a so-called groove guide, consists of two parallel metal plates or bands with a shallow axially-directed groove in each. The plasma stream to be tested flows between these plates in a direction perpendicular to the direction of propagation of the microwaves. The groove guide has properties similar to the ideal parallel-plate guide with infinite side wards extension, but the energy flow is concentrated in the middle region by the grooves. An approximate analysis, the transverse resonance analysis, has been used to calculate the field distribution and propagation characteristics of the guide. Because of the cross-sectional dimensions of the MHD channel in question (height 16 mm) and the wavelength (4 mm) chosen, considering the expected electron density, the groove guide had to be built for use in an oversized quasi-optical technique. The transition from rectangular (hollow pipe) guide to the open guide is done in two steps. With a good knowledge of the groove guide data and an appropriate theory of propagation of electromagnetic waves in ionized media, measuring phase shift and additional damping of the microwaves by introduction of the ionized gas allows the electron density and collision frequency, two of the most important plasma parameters, to be evaluated. The system

  6. Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride

    Energy Technology Data Exchange (ETDEWEB)

    Provine, J., E-mail: jprovine@stanford.edu; Schindler, Peter; Kim, Yongmin; Walch, Steve P.; Kim, Hyo Jin [Department of Mechanical Engineering, Stanford University, Stanford, California 94305 (United States); Kim, Ki-Hyun [Manufacturing Technology Center, Samsung Electronics, Suwon, Gyeonggi-Do (Korea, Republic of); Prinz, Fritz B. [Department of Mechanical Engineering, Stanford University, Stanford, California 94305 (United States); Department of Materials Science and Engineering, Stanford University, Stanford, California 94305 (United States)

    2016-06-15

    The continued scaling in transistors and memory elements has necessitated the development of atomic layer deposition (ALD) of silicon nitride (SiN{sub x}), particularly for use a low k dielectric spacer. One of the key material properties needed for SiN{sub x} films is a low wet etch rate (WER) in hydrofluoric (HF) acid. In this work, we report on the evaluation of multiple precursors for plasma enhanced atomic layer deposition (PEALD) of SiN{sub x} and evaluate the film’s WER in 100:1 dilutions of HF in H{sub 2}O. The remote plasma capability available in PEALD, enabled controlling the density of the SiN{sub x} film. Namely, prolonged plasma exposure made films denser which corresponded to lower WER in a systematic fashion. We determined that there is a strong correlation between WER and the density of the film that extends across multiple precursors, PEALD reactors, and a variety of process conditions. Limiting all steps in the deposition to a maximum temperature of 350 °C, it was shown to be possible to achieve a WER in PEALD SiN{sub x} of 6.1 Å/min, which is similar to WER of SiN{sub x} from LPCVD reactions at 850 °C.

  7. Structural, morphological and mechanical properties of niobium nitride thin films grown by ion and electron beams emanated from plasma

    Science.gov (United States)

    Siddiqui, Jamil; Hussain, Tousif; Ahmad, Riaz; Umar, Zeeshan A.; Abdus Samad, Ubair

    2016-05-01

    The influence of variation in plasma deposition parameters on the structural, morphological and mechanical characteristics of the niobium nitride films grown by plasma-emanated ion and electron beams are investigated. Crystallographic investigation made by X-ray diffractometer shows that the film synthesized at 10 cm axial distance with 15 plasma focus shots (PFS) exhibits better crystallinity when compared to the other deposition conditions. Morphological analysis made by scanning electron microscope reveals a definite granular pattern composed of homogeneously distributed nano-spheroids grown as clustered particles for the film synthesized at 10 cm axial distance for 15 PFS. Roughness analysis demonstrates higher rms roughness for the films synthesized at shorter axial distance and by greater number of PFS. Maximum niobium atomic percentage (35.8) and maximum average hardness (19.4 ± 0.4 GPa) characterized by energy-dispersive spectroscopy and nano-hardness analyzer respectively are observed for film synthesized at 10 cm axial distance with 15 PFS.

  8. The structural and electronic properties of amine-functionalized boron nitride nanotubes via ammonia plasmas: a density functional theory study

    International Nuclear Information System (INIS)

    Cao Fenglei; Ji Yuemeng; Zhao Cunyuan; Ren Wei

    2009-01-01

    The reaction behavior of the chemical modification of boron nitride nanotubes (BNNTs) with ammonia plasmas has been investigated by density functional theory (DFT) calculations. Unlike previously studied functionalization with NH 3 and amino functional groups, we found that NH 2 * radicals involved in the ammonia plasmas can be covalently incorporated to BNNTs through a strong single B-N bond. Subsequently, the H * radicals also involved in the ammonia plasmas would prefer to combine with the N atoms neighboring the NH 2 -functionalized B atoms. Our study revealed that this reaction behavior can be elucidated using the frontier orbital theory. The calculated band structures and density of states (DOS) indicate that this modification is an effective method to modulate the electronic properties of BNNTs. We have discussed various defects on the surface of BNNTs generated by collisions of N 2 + ions. For most defects considered, the reactivity of the functionalization of BNNTs with NH 2 * are enhanced. Our conclusions are independent of the chirality, and the diameter dependence of the reaction energies is presented.

  9. Diagnostics of microwave assisted electron cyclotron resonance plasma source for surface modification of nylon 6

    Science.gov (United States)

    More, Supriya E.; Das, Partha Sarathi; Bansode, Avinash; Dhamale, Gayatri; Ghorui, S.; Bhoraskar, S. V.; Sahasrabudhe, S. N.; Mathe, Vikas L.

    2018-01-01

    Looking at the increasing scope of plasma processing of materials surface, here we present the development and diagnostics of a microwave assisted Electron Cyclotron Resonance (ECR) plasma system suitable for surface modification of polymers. Prior to the surface-treatment, a detailed diagnostic mapping of the plasma parameters throughout the reactor chamber was carried out by using single and double Langmuir probe measurements in Ar plasma. Conventional analysis of I-V curves as well as the elucidation form of the Electron Energy Distribution Function (EEDF) has become the source of calibration of plasma parameters in the reaction chamber. The high energy tail in the EEDF of electron temperature is seen to extend beyond 60 eV, at much larger distances from the ECR zone. This proves the suitability of the rector for plasma processing, since the electron energy is much beyond the threshold energy of bond breaking in most of the polymers. Nylon 6 is used as a representative candidate for surface processing in the presence of Ar, H2 + N2, and O2 plasma, treated at different locations inside the plasma chamber. In a typical case, the work of adhesion is seen to almost get doubled when treated with oxygen plasma. Morphology of the plasma treated surface and its hydrophilicity are discussed in view of the variation in electron density and electron temperature at these locations. Nano-protrusions arising from plasma treatment are set to be responsible for the hydrophobicity. Chemical sputtering and physical sputtering are seen to influence the surface morphology on account of sufficient electron energies and increased plasma potential.

  10. Microwave receivers for fast-ion detection in fusion plasmas

    International Nuclear Information System (INIS)

    Furtula, V.

    2012-02-01

    The main objectives of this thesis are to determine fundamental properties of a millimeter wave radiometer used to detect radiation associated with dynamics of fast ions and to investigate possibilities for improvements and new designs. The detection of fast ions is based on a principle called collective Thomson scattering (CTS). The Danish CTS group has been involved in fusion plasma experiments for more than 10 years and the future plans will most probably include the International Thermonuclear Experimental Reactor (ITER). Current CTS systems designed by the Danish group are specified for the frequency range from 100 to 110 GHz. In this thesis we follow the path of the radiation from a fusion plasma to the data acquisition unit. Firstly, the scattered radiation passes through the quasi-optical system. Quasi-optical elements required to be installed on the high field side (HFS) on the ITER are assessed. For the ITER HFS receiver we have designed and measured the quasi-optical components that form a transmission link between the plasma and the radio frequency (RF) electronics. This HFS receiver is required to resolve the near parallel velocity components created by the alpha particles. Secondly, the radiation will encounter the RF part. This part is not yet designed for ITER, but instead the solution is addressed to the CTS receiver installed at ASDEX Upgrade (AUG).We have put effort to thoroughly examine and evaluate the performance of the receiver components and the receiver as an assembled unit. We have measured and analyzed all the receiver components starting from the two notch filters to the fifty square-law detector diodes. The receiver sensitivity is calculated from the system measurements and compared with the expected sensitivity based on the individual component measurements. Besides the system considerations we have also studied improvements of two critical components of the receiver. The first component is the notch filter, which is needed to block

  11. Optical and passivating properties of hydrogenated amorphous silicon nitride deposited by plasma enhanced chemical vapour deposition for application on silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Wight, Daniel Nilsen

    2008-07-01

    Within this thesis, several important subjects related to the use of amorphous silicon nitride made by plasma enhanced chemical vapour deposition as an anti-reflective coating on silicon solar cells are presented. The first part of the thesis covers optical simulations to optimise single and double layer anti-reflective coatings with respect to optical performance when situated on a silicon solar cell. The second part investigates the relationship between important physical properties of silicon nitride films when deposited under different conditions. The optical simulations were either based on minimising the reflectance off a silicon nitride/silicon wafer stack or maximising the transmittance through the silicon nitride into the silicon wafer. The former method allowed consideration of the reflectance off the back surface of the wafer, which occurs typically at wavelengths above 1000 nm due to the transparency of silicon at these wavelengths. However, this method does not take into consideration the absorption occurring in the silicon nitride, which is negligible at low refractive indexes but quite significant when the refractive index increases above 2.1. For high-index silicon nitride films, the latter method is more accurate as it considers both reflectance and absorbance in the film to calculate the transmittance into the Si wafer. Both methods reach similar values for film thickness and refractive index for optimised single layer anti-reflective coatings, due to the negligible absorption occurring in these films. For double layer coatings, though, the reflectance based simulations overestimated the optimum refractive index for the bottom layer, which would have lead to excessive absorption if applied to real anti-reflective coatings. The experimental study on physical properties for silicon nitride films deposited under varying conditions concentrated on the estimation of properties important for its applications, such as optical properties, passivation

  12. Role of Radio Frequency and Microwaves in Magnetic Fusion Plasma Research

    Directory of Open Access Journals (Sweden)

    Hyeon K. Park

    2017-10-01

    Full Text Available The role of electromagnetic (EM waves in magnetic fusion plasma—ranging from radio frequency (RF to microwaves—has been extremely important, and understanding of EM wave propagation and related technology in this field has significantly advanced magnetic fusion plasma research. Auxiliary heating and current drive systems, aided by various forms of high-power RF and microwave sources, have contributed to achieving the required steady-state operation of plasmas with high temperatures (i.e., up to approximately 10 keV; 1 eV = 10000 K that are suitable for future fusion reactors. Here, various resonance values and cut-off characteristics of wave propagation in plasmas with a nonuniform magnetic field are used to optimize the efficiency of heating and current drive systems. In diagnostic applications, passive emissions and active sources in this frequency range are used to measure plasma parameters and dynamics; in particular, measurements of electron cyclotron emissions (ECEs provide profile information regarding electron temperature. Recent developments in state-of-the-art 2D microwave imaging systems that measure fluctuations in electron temperature and density are largely based on ECE. The scattering process, phase delays, reflection/diffraction, and the polarization of actively launched EM waves provide us with the physics of magnetohydrodynamic instabilities and transport physics.

  13. Novel Cyclosilazane-Type Silicon Precursor and Two-Step Plasma for Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride.

    Science.gov (United States)

    Park, Jae-Min; Jang, Se Jin; Lee, Sang-Ick; Lee, Won-Jun

    2018-03-14

    We designed cyclosilazane-type silicon precursors and proposed a three-step plasma-enhanced atomic layer deposition (PEALD) process to prepare silicon nitride films with high quality and excellent step coverage. The cyclosilazane-type precursor, 1,3-di-isopropylamino-2,4-dimethylcyclosilazane (CSN-2), has a closed ring structure for good thermal stability and high reactivity. CSN-2 showed thermal stability up to 450 °C and a sufficient vapor pressure of 4 Torr at 60 °C. The energy for the chemisorption of CSN-2 on the undercoordinated silicon nitride surface as calculated by density functional theory method was -7.38 eV. The PEALD process window was between 200 and 500 °C, with a growth rate of 0.43 Å/cycle. The best film quality was obtained at 500 °C, with hydrogen impurity of ∼7 atom %, oxygen impurity less than 2 atom %, low wet etching rate, and excellent step coverage of ∼95%. At 300 °C and lower temperatures, the wet etching rate was high especially at the lower sidewall of the trench pattern. We introduced the three-step PEALD process to improve the film quality and the step coverage on the lower sidewall. The sequence of the three-step PEALD process consists of the CSN-2 feeding step, the NH 3 /N 2 plasma step, and the N 2 plasma step. The H radicals in NH 3 /N 2 plasma efficiently remove the ligands from the precursor, and the N 2 plasma after the NH 3 plasma removes the surface hydrogen atoms to activate the adsorption of the precursor. The films deposited at 300 °C using the novel precursor and the three-step PEALD process showed a significantly improved step coverage of ∼95% and an excellent wet etching resistance at the lower sidewall, which is only twice as high as that of the blanket film prepared by low-pressure chemical vapor deposition.

  14. The origin of traps and the effect of nitrogen plasma in oxide-nitride-oxide structures for non-volatile memories

    International Nuclear Information System (INIS)

    Kim, W. S.; Kwak, D. W.; Oh, J. S.; Lee, D. W.; Cho, H. Y.

    2010-01-01

    Ultrathin oxide-nitride-oxide (ONO) dielectric stacked layers are fundamental structures of silicon-oxide-nitride-oxide-silicon (SONOS) non-volatile memory devices in which information is known to be stored as charges trapped in silicon nitride. Deep-level transient spectroscopy (DLTS) and a capacitance-voltage (CV) analysis were introduced to observe the trap behavior related to the memory effect in memory devices. The DLTS results verified that the nitride-related traps were a dominant factor in the memory effect. The energy of hole traps was 0.307 eV above the balance band. To improve the memory effects of the non-volatile memory devices with ONO structures, we introduced a nitrogen plasma treatment. After the N-plasma treatment, the flat-band voltage shift (ΔV FB ) was increased by about 1.5 times. The program and the erase (P-E) characteristics were also shown to be better than those for the as-ONO structure. In addition, the retention characteristics were improved by over 2.4 times.

  15. High-power microwave transmission and launching systems for fusion plasma heating systems

    International Nuclear Information System (INIS)

    Bigelow, T.S.

    1989-01-01

    Microwave power in the 30- to 300-GHz frequency range is becoming widely used for heating of plasma in present-day fusion energy magnetic confinement experiments. Microwave power is effective in ionizing plasma and heating electrons through the electron cyclotron heating (ECH) process. Since the power is absorbed in regions of the magnetic field where resonance occurs and launching antennas with narrow beam widths are possible, power deposition location can be highly controlled. This is important for maximizing the power utilization efficiency and improving plasma parameters. Development of the gyrotron oscillator tube has advanced in recent years so that a 1-MW continuous-wave, 140-GHz power source will soon be available. Gyrotron output power is typically in a circular waveguide propagating a circular electric mode (such as TE 0,2 ) or a whispering-gallery mode (such as TE 15,2 ), depending on frequency and power level. An alternative high-power microwave source currently under development is the free-electron laser (FEL), which may be capable of generating 2-10 MW of average power at frequencies of up to 500 GHz. The FEL has a rectangular output waveguide carrying the TE 0,1 mode. Because of its higher complexity and cost, the high-average-power FEL is not yet as extensively developed as the gyrotron. In this paper, several types of operating ECH transmission systems are discussed, as well systems currently being developed. The trend in this area is toward higher power and frequency due to the improvements in plasma density and temperature possible. Every system requires a variety of components, such as mode converters, waveguide bends, launchers, and directional couplers. Some of these components are discussed here, along with ongoing work to improve their performance. 8 refs

  16. Ion nitriding of aluminium

    International Nuclear Information System (INIS)

    Fitz, T.

    2002-09-01

    The present study is devoted to the investigation of the mechanism of aluminium nitriding by a technique that employs implantation of low-energy nitrogen ions and diffusional transport of atoms. The nitriding of aluminium is investigated, because this is a method for surface modification of aluminium and has a potential for application in a broad spectrum of fields such as automobile, marine, aviation, space technologies, etc. However, at present nitriding of aluminium does not find any large scale industrial application, due to problems in the formation of stoichiometric aluminium nitride layers with a sufficient thickness and good quality. For the purposes of this study, ion nitriding is chosen, as an ion beam method with the advantage of good and independent control over the process parameters, which thus can be related uniquely to the physical properties of the resulting layers. Moreover, ion nitriding has a close similarity to plasma nitriding and plasma immersion ion implantation, which are methods with a potential for industrial application. (orig.)

  17. Voyager microwave scintillation measurements of solar wind plasma parameters

    International Nuclear Information System (INIS)

    Martin, J.M.

    1985-01-01

    During the solar conjunctions of Voyager 1 and 2 spacecraft in August 1979, September 1980, and November 1982, temporal variations of intensity and frequency of the dual-wavelength (3.6 and 13 cm) radio transmissions from the spacecraft were observed and subsequently analyzed to infer characteristics of the solar wind plasma flow. Measurements of the temporal wave structure function were used to estimate the spectral index of the power law spatial spectrum of irregularities. Theoretical-intensity scintillation spectra were compared with measured intensity spectra to obtain least-squares estimates of (1) mean velocity, (2) random velocity, (3) axial ratio, and (4) electron density standard deviation. Uncertainties in parameter estimates were calculated by standard propagation of errors techniques. Mean velocity and electron density standard deviations in 1979-1980 show little dependence on solar latitude. Density standard deviation estimates were 3-10% of the background mean density and mean velocity estimates ranged from approx.200 km/s inside 17 solar radii to approx.300 km/s at 25 solar radii. 1982 density standard deviation estimates increased rapidly with latitude near 45 0 N, then sharply decreased north of that latitude, indicating the existence of a polar region of reduced fluctuations surrounded by a thin cone of strong density irregularities

  18. 8 GHz, high power, microwave system for heating of thermonuclear plasmas

    International Nuclear Information System (INIS)

    Di Giovenale, S.; Fortunato, T.; Mirizzi, F.; Roccon, M.; Sassi, M.; Tuccillo, A.A.; Maffia, G.; Baldi, L.

    1993-01-01

    The Frascati Tokamak Upgrade (FTU) is a machine included in the European Thermonuclear Fusion Program aimed at investigating high density plasmas in the presence of powerful additional RF heating systems. The Lower Hybrid Resonant Heating (LHRH) system, based on 9 independent modules, works at 8 GHz, and will generate, at full performances, a total amount of 9 MW, in the pulsed regime (pulse length = 1 s, duty cycle = 1/600). The microwave power source is a gyrotron oscillator, developed by Thomson Tubes Electroniques (France) for this specific application, and capable of producing up to 1 MW. An overmoded, low loss, circular waveguide transmits the RF power toward the plasma; an array of 12x4 rectangular waveguides (the 'grill') launches this power into the plasma. The paper describes the LHRH system for FTU and analyses both its main performances and experimental results

  19. Generation and confinement of microwave gas-plasma in photonic dielectric microstructure.

    Science.gov (United States)

    Debord, B; Jamier, R; Gérôme, F; Leroy, O; Boisse-Laporte, C; Leprince, P; Alves, L L; Benabid, F

    2013-10-21

    We report on a self-guided microwave surface-wave induced generation of ~60 μm diameter and 6 cm-long column of argon-plasma confined in the core of a hollow-core photonic crystal fiber. At gas pressure of 1 mbar, the micro-confined plasma exhibits a stable transverse profile with a maximum gas-temperature as high as 1300 ± 200 K, and a wall-temperature as low as 500 K, and an electron density level of 10¹⁴ cm⁻³. The fiber guided fluorescence emission presents strong Ar⁺ spectral lines in the visible and near UV. Theory shows that the observed combination of relatively low wall-temperature and high ionisation rate in this strongly confined configuration is due to an unprecedentedly wide electrostatic space-charge field and the subsequent ion acceleration dominance in the plasma-to-gas power transfer.

  20. Surface nanostructuring in the carbon–silicon(100) system upon microwave plasma treatment

    Energy Technology Data Exchange (ETDEWEB)

    Yafarov, R. K., E-mail: pirpc@yandex.ru; Shanygin, V. Ya. [Russian Academy of Sciences, Kotel’nikov Institute of Radio Engineering and Electronics, Saratov Branch (Russian Federation)

    2017-04-15

    The study is concerned with the physical and chemical processes and the mechanisms of the effect of plasma preparation of a surface on the systematic features of condensation and surface phase transformations during the formation of Si–C mask domains on p-Si(100) crystals by the deposition of submonolayer C coatings in the microwave plasma of low-pressure ethanol vapors. It is shown that, at short durations of the deposition of carbon onto silicon wafers with a natural-oxide coating at a temperature of 100°C, the formation of domains is observed. The lateral dimensions of the domains lie in the range from 10–15 to 200 nm, and the heights of ridges produced by the plasma chemical etching of silicon through the mask domain coatings vary in the range from 40 to 80 nm.

  1. Surface modification and stability of detonation nanodiamonds in microwave gas discharge plasma

    Energy Technology Data Exchange (ETDEWEB)

    Stanishevsky, Andrei V., E-mail: astan@uab.edu; Walock, Michael J.; Catledge, Shane A.

    2015-12-01

    Graphical abstract: - Highlights: • Single and binary gas plasma modification of nanodiamond powders studied. • Temperature-dependent effect of N{sub 2} and N{sub 2}/H{sub 2} plasma reported for the first time. • Role of H{sub 2} in H{sub 2}/N{sub 2} and H{sub 2}/O{sub 2} plasma modification of nanodiamond discussed. - Abstract: Detonation nanodiamonds (DND), with low hydrogen content, were exposed to microwave plasma generated in pure H{sub 2}, N{sub 2}, and O{sub 2} gases and their mixtures, and investigated using X-ray diffraction (XRD), Fourier Transform Infrared (FTIR), Raman, and X-ray photoelectron spectroscopies. Considerable alteration of the DND surface was observed under the plasma conditions for all used gases, but the diamond structure of the DND particle core was preserved in most cases. The stabilizing effect of H{sub 2} in H{sub 2}/N{sub 2} and H{sub 2}/O{sub 2} binary gas plasmas on the DND structure and the temperature-dependent formation of various CNH{sub x} surface groups in N{sub 2} and H{sub 2}/N{sub 2} plasmas were observed and discussed for the first time. DND surface oxidation and etching were the main effects of O{sub 2} plasma, whereas the N{sub 2} plasma led to DND surfaces rich in amide groups below 1073 K and nitrile groups at higher temperatures. Noticeable graphitization of the DND core structure was detected only in N{sub 2} plasma when the substrate temperature was above 1103 K.

  2. Plasma synthesis and HPHT consolidation of BN nanoparticles, nanospheres, and nanotubes to produce nanocrystalline cubic boron nitride

    Science.gov (United States)

    Stout, Christopher

    Plasma methods offer a variety of advantages to nanomaterials synthesis. The process is robust, allowing varying particle sizes and phases to be generated simply by modifying key parameters. The work here demonstrates a novel approach to nanopowder synthesis using inductively-coupled plasma to decompose precursor, which are then quenched to produce a variety of boron nitride (BN)-phase nanoparticles, including cubic phase, along with short-range-order nanospheres (e.g., nano-onions) and BN nanotubes. Cubic BN (c-BN) powders can be generated through direct deposition onto a chilled substrate. The extremely-high pyrolysis temperatures afforded by the equilibrium plasma offer a unique particle growth environment, accommodating long deposition times while exposing resulting powders to temperatures in excess of 5000K without any additional particle nucleation and growth. Such conditions can yield short-range ordered amorphous BN structures in the form of 20nm diameter nanospheres. Finally, when introducing a rapid-quenching counter-flow gas against the plasma jet, high aspect ratio nanotubes are synthesized, which are collected on substrate situated radially. The benefits of these morphologies are also evident in high-pressure/high-temperature consolidation experiments, where nanoparticle phases can offer a favorable conversion route to super-hard c-BN while maintaining nanocrystallinity. Experiments using these morphologies are shown to begin to yield c-BN conversion at conditions as low as 2.0 GPa and 1500°C when using micron sized c-BN seeding to create localized regions of high pressures due to Hertzian forces acting on the nanoparticles.

  3. Characterization of microwave plasma in a multicusp using 2D emission based tomography: Bessel modes and wave absorption

    Science.gov (United States)

    Rathore, Kavita; Bhattacharjee, Sudeep; Munshi, Prabhat

    2017-06-01

    A tomographic method based on the Fourier transform is used for characterizing a microwave plasma in a multicusp (MC), in order to obtain 2D distribution of plasma emissions, plasma (electron) density (Ne) and temperature (Te). The microwave plasma in the MC is characterized as a function of microwave power, gas pressure, and axial distance. The experimentally obtained 2D emission profiles show that the plasma emissions are generated in a circular ring shape. There are usually two bright rings, one at the plasma core and another near the boundary. The experimental results are validated using a numerical code that solves Maxwell's equations inside a waveguide filled with a plasma in a magnetic field, with collisions included. It is inferred that the dark and bright circular ring patterns are a result of superposition of Bessel modes (TE11 and TE21) of the wave electric field inside the plasma filled MC, which are in reasonable agreement with the plasma emission profiles. The tomographically obtained Ne and Te profiles indicate higher densities in the plasma core (˜1010 cm-3) and enhanced electron temperature in the ECR region (˜13 eV), which are in agreement with earlier results using a Langmuir probe and optical emission spectroscopy (OES) diagnostics.

  4. Low temperature RF plasma nitriding of self-organized TiO2 nanotubes for effective bandgap reduction

    Science.gov (United States)

    Bonelli, Thiago Scremin; Pereyra, Inés

    2018-06-01

    Titanium dioxide is a widely studied semiconductor material found in many nanostructured forms, presenting very interesting properties for several applications, particularly photocatalysis. TiO2 nanotubes have a high surface-to-volume ratio and functional electronic properties for light harvesting. Despite these manifold advantages, TiO2 photocatalytic activity is limited to UV radiation due to its large band gap. In this work, TiO2 nanotubes produced by electrochemical anodization were submitted to plasma nitriding processes in a PECVD reactor. The plasma parameters were evaluated to find the best conditions for gap reduction, in order to increase their photocatalytic activity. The pressure and RF power density were varied from 0.66 to 2.66 mbar and 0.22 to 3.51 W/cm2 respectively. The best gap reduction, to 2.80 eV, was achieved using a pressure of 1.33 mbar and 1.75 W/cm2 RF power at 320 °C, during a 2-h process. This leads to a 14% reduction in the band gap value and an increase of 25.3% in methylene blue reduction, doubling the range of solar photons absorption from 5 to 10% of the solar spectrum.

  5. Characterization of stainless steel through Scanning Electron Microscopy, nitrided in the process of implantation of immersed ions in plasma

    International Nuclear Information System (INIS)

    Moreno S, H.

    2003-01-01

    The present project carries out the investigation of the nitridation of the austenitic stainless steel schedule 304, applying the novel technology of installation of nitrogen ions in immersed materials in plasma (Plll), by means of which they modify those properties of the surface of the steel. The obtained results by means of tests of Vickers microhardness, shows that the hardness was increment from 266 to 740 HV (microhardness units). It was determined by means of scanning electron microscopy, the one semiquantitative chemical analysis of the elements that constitute the austenitic stainless steel schedule 304; the obtained results, show to the nitrogen like an element of their composition in the pieces where carried out to end the PIII technology. The parameters of the plasma with which carried out the technology Plll, were monitored and determined by means of electric probes, and with which it was determined that the density of particles is stable in the interval of 1x10 -1 at 3x10 -1 Torr, and it is where better results of hardness were obtained. That reported in this work, they are the first results obtained when applying the technology Plll in Mexico, and with base in these, it is even necessary to investigate and to deepen until to dominate the process and to be in possibilities of proposing it to be carried out and exploited in an industrial way. (Author)

  6. Carbon dioxide elimination and regeneration of resources in a microwave plasma torch.

    Science.gov (United States)

    Uhm, Han S; Kwak, Hyoung S; Hong, Yong C

    2016-04-01

    Carbon dioxide gas as a working gas produces a stable plasma-torch by making use of 2.45 GHz microwaves. The temperature of the torch flame is measured by making use of optical spectroscopy and a thermocouple device. Two distinctive regions are exhibited, a bright, whitish region of a high-temperature zone and a bluish, dimmer region of a relatively low-temperature zone. The bright, whitish region is a typical torch based on plasma species where an analytical investigation indicates dissociation of a substantial fraction of carbon dioxide molecules, forming carbon monoxides and oxygen atoms. The emission profiles of the oxygen atoms and the carbon monoxide molecules confirm the theoretical predictions of carbon dioxide disintegration in the torch. Various hydrocarbon materials may be introduced into the carbon dioxide torch, regenerating new resources and reducing carbon dioxide concentration in the torch. As an example, coal powders in the carbon dioxide torch are converted into carbon monoxide according to the reaction of CO2 + C → 2CO, reducing a substantial amount of carbon dioxide concentration in the torch. In this regards, the microwave plasma torch may be one of the best ways of converting the carbon dioxides into useful new materials. Copyright © 2015 Elsevier Ltd. All rights reserved.

  7. Characterization of an Atmospheric-Pressure Argon Plasma Generated by 915 MHz Microwaves Using Optical Emission Spectroscopy

    Directory of Open Access Journals (Sweden)

    Robert Miotk

    2017-01-01

    Full Text Available The paper presents the investigations of an atmospheric-pressure argon plasma generated at 915 MHz microwaves using the optical emission spectroscopy (OES. The 915 MHz microwave plasma was inducted and sustained in a waveguide-supplied coaxial-line-based nozzleless microwave plasma source. The aim of presented investigations was to estimate parameters of the generated plasma, that is, excitation temperature of electrons Texc, temperature of plasma gas Tg, and concentration of electrons ne. Assuming that excited levels of argon atoms are in local thermodynamic equilibrium, Boltzmann method allowed in determining the Texc temperature in the range of 8100–11000 K. The temperature of plasma gas Tg was estimated by comparing the simulated spectra of the OH radical to the measured one in LIFBASE program. The obtained Tg temperature ranged in 1200–2800 K. Using a method based on Stark broadening of the Hβ line, the concentration of electrons ne was determined in the range from 1.4 × 1015 to 1.7 × 1015 cm−3, depending on the power absorbed by the microwave plasma.

  8. Transmission characteristics of microwave in a glow-discharge dusty plasma

    Science.gov (United States)

    Jia, Jieshu; Yuan, Chengxun; Gao, Ruilin; Liu, Sha; Yue, Feng; Wang, Ying; Zhou, Zhong-Xiang; Wu, Jian; Li, Hui

    2016-07-01

    In this study, the propagation characteristics of electromagnetic wave in a glow discharge plasma with dust particles are experimentally investigated. A helium alternating current glow discharge plasmas have been successfully generated. Measurements of the plasma parameters using Langmuir probes, in the absence of dust particles, provide plasma densities (ne) of 1017 m-3 and electron temperatures (Te) ranging from 2 to 4 eV. Dusty plasmas are made by adding 30 nm radius aluminum oxide (Al2O3) particles into the helium plasma. The density of the dust particle (nd) in the device is about 1011-1012 m-3. The propagation characteristics of electromagnetic waves are determined by a vector network analyzer with 4-6 GHz antennas. An apparent attenuation by the dust is observed, and the measured attenuation data are approximately in accordance with the theoretical calculations. The effects of gas pressure and input power on the propagation are also investigated. Results show that the transmission attenuation increases with the gas pressure and input power, the charged dust particles play a significant role in the microwave attenuation.

  9. High-power broad-band tunable microwave oscillator, driven by REB in plasma

    Energy Technology Data Exchange (ETDEWEB)

    Kuzelev, M V; Loza, O T; Ponomarev, A V; Rukhadze, A A; Strel` kov, P S; Shkvarunets, A G; Ulyanov, D K [General Physics Inst. of Russian Academy of Sciences, Moscow (Russian Federation)

    1997-12-31

    The radiation spectra of a plasma relativistic broad-band microwave oscillator were measured. A hollow relativistic electron beam (REB) was injected into the plasma waveguide, consisting of annular plasma in a circular metal waveguide. The radiation spectra were measured by means of a calorimeter-spectrometer with a large cross section in the band of 3-39 GHz. The mean frequency was tunable in the band of 20-27 GHz, the spectrum width was 5-25 GHz with a power level of 40-85 MW. Calculations were carried out based on non-linear theory, taking into account electromagnetic noise amplification due to REB injection into the plasma waveguide. According to the theory the radiation regime should change from the single-particle regime to the collective regime when the plasma density and the gap between the annular plasma and REB are increased. Comparison of the experimental results with the non-linear theory explains some peculiarities of the measured spectrum. (author). 4 figs., 2 refs.

  10. Microwave plasma chemical synthesis of nanocrystalline carbon film structures and study their properties

    Science.gov (United States)

    Bushuev, N.; Yafarov, R.; Timoshenkov, V.; Orlov, S.; Starykh, D.

    2015-08-01

    The self-organization effect of diamond nanocrystals in polymer-graphite and carbon films is detected. The carbon materials deposition was carried from ethanol vapors out at low pressure using a highly non-equilibrium microwave plasma. Deposition processes of carbon film structures (diamond, graphite, graphene) is defined. Deposition processes of nanocrystalline structures containing diamond and graphite phases in different volume ratios is identified. The solid film was obtained under different conditions of microwave plasma chemical synthesis. We investigated the electrical properties of the nanocrystalline carbon films and identified it's from various factors. Influence of diamond-graphite film deposition mode in non-equilibrium microwave plasma at low pressure on emission characteristics was established. This effect is justified using the cluster model of the structure of amorphous carbon. It was shown that the reduction of bound hydrogen in carbon structures leads to a decrease in the threshold electric field of emission from 20-30 V/m to 5 V/m. Reducing the operating voltage field emission can improve mechanical stability of the synthesized film diamond-graphite emitters. Current density emission at least 20 A/cm2 was obtained. Nanocrystalline carbon film materials can be used to create a variety of functional elements in micro- and nanoelectronics and photonics such as cold electron source for emission in vacuum devices, photonic devices, cathodoluminescent flat display, highly efficient white light sources. The obtained graphene carbon net structure (with a net size about 6 μm) may be used for the manufacture of large-area transparent electrode for solar cells and cathodoluminescent light sources

  11. Iron-based Nanocomposite Synthesised by Microwave Plasma Decomposition of Iron Pentacarbonyl

    Czech Academy of Sciences Publication Activity Database

    David, Bohumil; Pizúrová, Naděžda; Schneeweiss, Oldřich; Hoder, T.; Kudrle, V.; Janča, J.

    2007-01-01

    Roč. 263, - (2007), s. 147-152 ISSN 1012-0386. [Diffusion and Thermodynamics of Materials /IX/. Brno, 13.09.2006-15.09.2006] R&D Projects: GA ČR GA202/04/0221 Institutional research plan: CEZ:AV0Z20410507 Keywords : iron-based nanopowder * synthesis * microwave plasma method Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 0.483, year: 2005 http://www.scientific.net/3-908451-35-3/3.html

  12. Low Temperature Graphene Synthesis from Poly(methyl methacrylate) Using Microwave Plasma Treatment

    Science.gov (United States)

    Yamada, Takatoshi; Ishihara, Masatou; Hasegawa, Masataka

    2013-11-01

    A graphene film having low sheet resistance (600 Ω/sq.) was synthesized at low temperatures of 280 °C. Utilizing microwave plasma treatment, graphene films were synthesized from a solid phase on a copper surface. The full width at half maximum of the 2D-band in the Raman spectrum indicated that a high quality graphene film was formed. Cross-sectional transmission electron microscopy observation revealed that the deposited graphene films consisted of single- or double-layer graphene flakes of nanometer order on the Cu surface, which agrees with the estimated number of layers from an average optical transmittance of 96%.

  13. Carbon nanosheets by microwave plasma enhanced chemical vapor deposition in CH4-Ar system

    International Nuclear Information System (INIS)

    Wang Zhipeng; Shoji, Mao; Ogata, Hironori

    2011-01-01

    We employ a new gas mixture of CH 4 -Ar to fabricate carbon nanosheets by microwave plasma enhanced chemical vapor deposition at the growth temperature of less than 500 deg. C. The catalyst-free nanosheets possess flower-like structures with a large amount of sharp edges, which consist of a few layers of graphene sheets according to the observation by transmission electron microscopy. These high-quality carbon nanosheets demonstrated a faster electron transfer between the electrolyte and the nanosheet surface, due to their edge defects and graphene structures.

  14. Plasma density determination by microwave interferometry. The 2 mm interferometer of the TJ-1 tokamak

    International Nuclear Information System (INIS)

    Manero, F.; Martin, R.

    1984-01-01

    In this paper a description is given of the microwave interferometer used for measuring the plasma electronic density in the TJ-1 Tokamak of Fusion Division of JEN. The principles of the electronic density measurement are discussed in detail, as well as those concerning the determination of density profiles from experimental data. A description of the interferometer used in the TJ-1 Tokamak is given, together with a detailed analysis of the circuits which constitute the measuring chain. The working principles of the klystron reflex and hybrid rings are also presented. (author)

  15. Observation of large-amplitude ion acoustic wave in microwave-plasma interaction experiments

    International Nuclear Information System (INIS)

    Yugami, Noboru; Nishida, Yasushi

    1997-01-01

    Large amplitude ion acoustic wave, which is not satisfied with a linear dispersion relationship of ion acoustic wave, is observed in microwave-plasma interaction experiments. This ion acoustic wave is excited around critical density layer and begins to propagate to underdense region with a phase velocity one order faster than sound velocity C s , which is predicted by the linear theory, the phase velocity and the wave length of the wave decreases as it propagates. Finally, it converges to C s and strongly dumps. Diagnostic by the Faraday cup indicates that this ion acoustic wave is accompanied with a hot ion beam. (author)

  16. Plasma density determination by microwave interferometry .- The 2 mm interferometer of the TJ-1 Tokamak

    International Nuclear Information System (INIS)

    Martin, R.; Manero, F.

    1984-01-01

    In this paper a description is given of the microwave interferometer used for measuring the plasma electronic density in the TJ-1 Tokamak of Fusion Division of JEN. The principles of the electronic density measurement are discussed in detail, as well as those concerning the determination of density pro files from experimental data. A description of the interferometer used in the TJ-1 Tokamak is given, together with a detailed analysis of the circuits which constitute the measuring chain. The working principles of the klystron reflex and hybrid rings are also presented. (Author) 23 refs

  17. Characterization of Orthorhombic α-MoO3 Microplates Produced by a Microwave Plasma Process

    International Nuclear Information System (INIS)

    Klinbumrung, A.; Thongtem, S.; Thongtem, T.; Thongtem, S.; Thongtem, T.

    2012-01-01

    Orthorhombic α-MoO 3 microplates were produced from (NH 4 ) 6 Mo 7 O 24 H 2 O solid powder by a 900 W microwave plasma for 40, 50, and 60?min. Phase, morphologies, and vibration modes were characterized by X-ray diffraction (XRD), selected area electron diffraction (SAED), scanning electron microscopy (SEM), and Raman and Fourier transform infrared (FTIR) spectroscopy. Sixty min processing resulted in the best crystallization of the α-MoO 3 phase, with photoluminescence (PL) in a wavelength range of 430-440 nm.

  18. Proceedings of microwave processing of materials 3

    International Nuclear Information System (INIS)

    Beatty, R.L.

    1992-01-01

    This book contains proceedings of the third MRS Symposium on Microwave Processing of Materials. Topics covered include: Microwave Processing Overviews, Numerical Modeling Techniques, Microwave Processing System Design, Microwave/Plasma Processing, Microwave/Materials Interactions, Microwave Processing of Ceramics, Microwave Processing of Polymers, Microwave Processing of Hazardous Wastes, Microwave NDE Techniques and Dielectric Properties and Measurements

  19. The relationship between cellular adhesion and surface roughness for polyurethane modified by microwave plasma radiation

    Directory of Open Access Journals (Sweden)

    Heidari S

    2011-04-01

    Full Text Available Saeed Heidari Keshel1, S Neda Kh Azhdadi2, Azadeh Asefnezhad2, Mohammad Sadraeian3, Mohamad Montazeri4, Esmaeil Biazar51Stem Cell Preparation Unit, Eye Research Center, Farabi Eye Hospital, Tehran University of Medical Sciences; 2Department of Biomaterial Engineering, Faculty of Biomedical Engineering, Science and Research Branch - Islamic Azad University; 3Young Researchers Club, Islamic Azad University, North Tehran Branch, Tehran; 4Faculty of Medical Sciences, Babol University of Medical Sciences, Babol; 5Department of Chemistry, Islamic Azad University, Tonekabon, IranAbstract: Surface modification of medical polymers is carried out to improve biocompatibility. In this study, conventional polyurethane was exposed to microwave plasma treatment with oxygen and argon gases for 30 seconds and 60 seconds. Attenuated total reflection Fourier transform infrared spectra investigations of irradiated samples indicated the presence of functional groups. Atomic force microscope images of samples irradiated with inert and active gases indicated the nanometric topography of the sample surfaces. Samples irradiated by oxygen plasma indicated high roughness compared with those irradiated by inert plasma for the different lengths of time. In addition, surface roughness increased with time, which can be due to a reduction of contact angle of samples irradiated by oxygen plasma. Contact angle analysis indicated a reduction in samples irradiated with both types of plasma. However, samples irradiated with oxygen plasma indicated lower contact angle compared with those irradiated by argon plasma. Cellular investigations with unrestricted somatic stem cells showed better adhesion, cell growth, and proliferation among samples radiated by oxygen plasma for longer than for normal samples.Keywords: surface topography, polyurethane, plasma treatment, cellular investigation

  20. Effect of hydrogen on the microstructure and electrochemical properties of Si nanoparticles synthesized by microwave plasma

    Energy Technology Data Exchange (ETDEWEB)

    Koo, Jeongboon; Lee, Jeongeun; Kim, Joonsoo; Jang, Boyun, E-mail: byjang@kier.re.kr

    2016-09-01

    We synthesized silicon (Si) nanoparticles using an atmospheric microwave plasma process, and investigated the effects of hydrogen (H{sub 2}) injection on their microstructure during the synthesis. Two nozzles were applied to inject H{sub 2} (swirling and rectilinear H{sub 2}). Our microstructural analysis indicated that the amount and method of H{sub 2} injection were critical for completion of the reaction from silicon tetrachloride (SiCl{sub 4}) to Si, as well as to obtain highly crystalline Si nanoparticles. The swirling H{sub 2} was especially critical due to its formation of vortex flow, which allowed relatively long residence time of the H-ions in plasma. The Si nanoparticles synthesized by the atmospheric plasma process had core-shell structures that consisted of crystalline Si cores with amorphous SiO{sub x} shells of 5–15 nm thickness. We also investigated the feasibility of the synthesized Si nanoparticles as anode materials in a lithium-ion battery (LIB). For the core-shell structured Si nanoparticles, we obtained the first reversible capacity of 1204 mAhg{sup −1}, and a capacity retention of 82.2% at the 50{sup th} cycle. - Highlights: • We synthesized Si nanoparticles by an atmospheric microwave plasma process. • We investigated the effects of injected H{sub 2} on the microstructures of Si nanoparticles. • Swirling H{sub 2} was critical, due to the formation of vortex flow in plasma. • The synthesized Si nanoparticles had core (crystalline Si)-shell (SiO{sub x}) structures. • The electrochemical properties depend on its core-shell structures as LIB anode.

  1. Surface nanocrystallization by surface mechanical attrition treatment and its effect on structure and properties of plasma nitrided AISI 321 stainless steel

    Energy Technology Data Exchange (ETDEWEB)

    Lin Yimin [State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, 18 Middle Tianshui Road, Lanzhou 730000 (China) and Graduate School of the Chinese Academy of Sciences, Beijing 100039 (China)]. E-mail: linyimin_2001@yahoo.com.cn; Lu Jian [LASMIS, University of Technology of Troyes, 10000 Troyes (France); Wang Liping [State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, 18 Middle Tianshui Road, Lanzhou 730000 (China); Graduate School of the Chinese Academy of Sciences, Beijing 100039 (China); Xu Tao [State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, 18 Middle Tianshui Road, Lanzhou 730000 (China); Xue Qunji [State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, 18 Middle Tianshui Road, Lanzhou 730000 (China)]. E-mail: qjxue@ns.lzb.ac.cn

    2006-12-15

    A plastic deformation surface layer with nanocrystalline grains was produced on AISI 321 austenitic stainless steel by means of surface mechanical attrition treatment (SMAT). Low-temperature nitriding of SMAT and un-SMAT AISI 321 stainless steel was carried out in pulsed-DC glow discharge. The effect of SMAT pretreatment on the microstructure and properties of the stainless steel were investigated using X-ray diffraction, scanning electron microscopy, transmission electron microscopy, Vickers hardness tester and UMT-2MT tribometer. The results show that the plasma nitriding of AISI 321 steel can be enhanced considerably by means of SMAT process before nitriding, and a much thicker nitrogen diffusion layer with higher hardness was obtained for the SMAT samples when compared with un-SMAT samples. In addition, the wear resistance and load capacity of the nitrided layers on the SMAT samples was much higher than that of the un-SMAT samples due to the thicker S phase case and the gradient nitrogen diffusion layer.

  2. Comparative study on nitridation and oxidation plasma interface treatment for AlGaN/GaN MIS-HEMTs with AlN gate dielectric

    Science.gov (United States)

    Zhu, Jie-Jie; Ma, Xiao-Hua; Hou, Bin; Chen, Li-Xiang; Zhu, Qing; Hao, Yue

    2017-02-01

    This paper demonstrated the comparative study on interface engineering of AlN/AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors (MIS-HEMTs) by using plasma interface pre-treatment in various ambient gases. The 15 nm AlN gate dielectric grown by plasma-enhanced atomic layer deposition significantly suppressed the gate leakage current by about two orders of magnitude and increased the peak field-effect mobility by more than 50%. NH3/N2 nitridation plasma treatment (NPT) was used to remove the 3 nm poor-quality interfacial oxide layer and N2O/N2 oxidation plasma treatment (OPT) to improve the quality of interfacial layer, both resulting in improved dielectric/barrier interface quality, positive threshold voltage (V th) shift larger than 0.9 V, and negligible dispersion. In comparison, however, NPT led to further decrease in interface charges by 3.38 × 1012 cm-2 and an extra positive V th shift of 1.3 V. Analysis with fat field-effect transistors showed that NPT resulted in better sub-threshold characteristics and transconductance linearity for MIS-HEMTs compared with OPT. The comparative study suggested that direct removing the poor interfacial oxide layer by nitridation plasma was superior to improving the quality of interfacial layer by oxidation plasma for the interface engineering of GaN-based MIS-HEMTs.

  3. Plasma-assisted CO2 conversion: optimizing performance via microwave power modulation

    Science.gov (United States)

    Britun, Nikolay; Silva, Tiago; Chen, Guoxing; Godfroid, Thomas; van der Mullen, Joost; Snyders, Rony

    2018-04-01

    Significant improvement in the energy efficiency of plasma-assisted CO2 conversion is achieved with applied power modulation in a surfaguide microwave discharge. The obtained values of CO2 conversion and energy efficiency are, respectively, 0.23 and 0.33 for a 0.95 CO2  +  0.05 N2 gas mixture. Analysis of the energy relaxation mechanisms shows that power modulation can potentially affect the vibrational-translational energy exchange in plasma. In our case, however, this mechanism does not play a major role, likely due to the low degree of plasma non-equilibrium in the considered pressure range. Instead, the gas residence time in the discharge active zone together with plasma pulse duration are found to be the main factors affecting the CO2 conversion efficiency at low plasma pulse repetition rates. This effect is confirmed experimentally by the in situ time-resolved two-photon absorption laser-induced fluorescence measurements of CO molecular density produced in the discharge as a result of CO2 decomposition.

  4. Air-water ‘tornado’-type microwave plasmas applied for sugarcane biomass treatment

    Science.gov (United States)

    Bundaleska, N.; Tatarova, E.; Dias, F. M.; Lino da Silva, M.; Ferreira, C. M.; Amorim, J.

    2014-02-01

    The production of cellulosic ethanol from sugarcane biomass is an attractive alternative to the use of fossil fuels. Pretreatment is needed to separate the cellulosic material, which is packed with hemicellulose and lignin in cell wall of sugarcane biomass. A microwave ‘tornado’-type air-water plasma source operating at 2.45 GHz and atmospheric pressure has been applied for this purpose. Samples of dry and wet biomass (˜2 g) have been exposed to the late afterglow plasma stream. The experiments demonstrate that the air-water highly reactive plasma environment provides a number of long-lived active species able to destroy the cellulosic wrapping. Scanning electron microscopy has been applied to analyse the morphological changes occurring due to plasma treatment. The effluent gas streams have been analysed by Fourier-transform infrared spectroscopy (FT-IR). Optical emission spectroscopy and FT-IR have been applied to determine the gas temperature in the discharge and late afterglow plasma zones, respectively. The optimal range of the operational parameters is discussed along with the main active species involved in the treatment process. Synergistic effects can result from the action of singlet O2(a 1Δg) oxygen, NO2, nitrous acid HNO2 and OH hydroxyl radical.

  5. Air–water ‘tornado’-type microwave plasmas applied for sugarcane biomass treatment

    International Nuclear Information System (INIS)

    Bundaleska, N; Tatarova, E; Dias, F M; Lino da Silva, M; Ferreira, C M; Amorim, J

    2014-01-01

    The production of cellulosic ethanol from sugarcane biomass is an attractive alternative to the use of fossil fuels. Pretreatment is needed to separate the cellulosic material, which is packed with hemicellulose and lignin in cell wall of sugarcane biomass. A microwave ‘tornado’-type air–water plasma source operating at 2.45 GHz and atmospheric pressure has been applied for this purpose. Samples of dry and wet biomass (∼2 g) have been exposed to the late afterglow plasma stream. The experiments demonstrate that the air–water highly reactive plasma environment provides a number of long-lived active species able to destroy the cellulosic wrapping. Scanning electron microscopy has been applied to analyse the morphological changes occurring due to plasma treatment. The effluent gas streams have been analysed by Fourier-transform infrared spectroscopy (FT-IR). Optical emission spectroscopy and FT-IR have been applied to determine the gas temperature in the discharge and late afterglow plasma zones, respectively. The optimal range of the operational parameters is discussed along with the main active species involved in the treatment process. Synergistic effects can result from the action of singlet O 2 (a  1 Δ g ) oxygen, NO 2 , nitrous acid HNO 2 and OH hydroxyl radical. (paper)

  6. The acceleration of a gaseous plasma by intense microwave fields in a constant inhomogeneous magnetic field

    International Nuclear Information System (INIS)

    Mourier, Georges

    1971-01-01

    A gaseous plasma excited by a powerful microwave source (up to 300 kW) was studied theoretically and experimentally. The large amplitude electric field excites, in a constant inhomogeneous magnetic field, a plasma near to the electron cyclotron resonance. These particles are accelerated to energies of between 100 and 10000 eV and subsequently drift to the regions of lower magnetic field. The ions are accelerated by the resulting electrostatic forces. Ion and electron currents of some tens of milli-amperes to a few amperes are obtained. The energy of the electrons is limited by their relativistic mass; a three-dimensional of space charge model is set up to describe the particle flow. (author) [fr

  7. A study of microwave interferometers for electron density measurements in REB-plasma experiments

    International Nuclear Information System (INIS)

    Saxena, A.C.; Paithankar, A.S.; Iyyengar, S.K.; Rohatgi, V.K.

    1981-01-01

    In order to select a suitable microwave interferometer for electron density measurements in Relativistic Electron Beam (REB)-Plasma Experiments, a study has been carried out of four types of interferometers, viz. simple interferometer, standing-wave interferometer, frequency and phase modulated interferometers. Various direct reading interferometers which give a voltage proportional to the phase shift, are also discussed. Systems have been analysed in terms of time resolution, phase sensitivity, system stability, ease of measurement etc. Theoretical and experimental limitations of various systems have been indicated. Summary of the various systems is presented in a table to aid the experimentalist to select the most appropriate system for the prevailina experimental conditions. Finally, an attempt has been made to find out the interferometer system best suited for REB-Plasma Experiments. (author)

  8. Computer model for the recombination zone of a microwave-plasma electrothermal rocket

    Energy Technology Data Exchange (ETDEWEB)

    Filpus, J.W.; Hawley, M.C.

    1987-01-01

    As part of a study of the microwave-plasma electrothermal rocket, a computer model of the flow regime below the plasma has been developed. A second-order model, including axial dispersion of energy and material and boundary conditions at infinite length, was developed to partially reproduce the absence of mass-flow rate dependence that was seen in experimental temperature profiles. To solve the equations of the model, a search technique was developed to find the initial derivatives. On integrating with a trial set of initial derivatives, the values and their derivatives were checked to judge whether the values were likely to attain values outside the practical regime, and hence, the boundary conditions at infinity were likely to be violated. Results are presented and directions for further development are suggested. 17 references.

  9. Characterization of the supersonic flowing microwave discharge using two dimensional plasma tomography

    Energy Technology Data Exchange (ETDEWEB)

    Nikolic, M.; Samolov, A.; Popovic, S.; Vuskovic, L.; Godunov, A. [Department of Physics, Center for Accelerator Science, Old Dominion University, Norfolk, Virginia 23529 (United States); Cuckov, F. [Department of Electrical and Computer Engineering, Old Dominion University, Norfolk, Virginia 23529 (United States)

    2013-03-14

    A tomographic numerical method based on the two-dimensional Radon formula for a cylindrical cavity has been employed for obtaining spatial distributions of the argon excited levels. The spectroscopy measurements were taken at different positions and directions to observe populations of excited species in the plasmoid region and the corresponding excitation temperatures. Excited argon states are concentrated near the tube walls, thus, confirming the assumption that the post discharge plasma is dominantly sustained by travelling surface wave. An automated optical measurement system has been developed for reconstruction of local plasma parameters of the plasmoid structure formed in an argon supersonic flowing microwave discharge. The system carries out angle and distance measurements using a rotating, flat mirror, as well as two high precision stepper motors operated by a microcontroller-based system and several sensors for precise feedback control.

  10. Surface analysis in steel nitrides by using Moessbauer spectroscopy

    International Nuclear Information System (INIS)

    Figueiredo, R.S. de.

    1991-07-01

    The formation of iron nitride layer at low temperatures, 600-700 K, by Moessbauer spectroscopy is studied. These layers were obtained basically through two different processes: ion nitriding and ammonia gas nitriding. A preliminary study about post-discharge nitriding was made using discharge in hollow cathode as well as microwave excitation. The assembly of these chambers is also described. The analysis of the nitrided samples was done by CEMS and CXMS, aided by optical microscopy, and the CEMS and CXMS detectors were constructed by ourselves. We also made a brief study about these detectors, testing as acetone as the mixture 80% He+10% C H 4 as detection gases for the use of CEMS. The surface analysis of the samples showed that in the ammonia gas process nitriding the nitrided layer starts by the superficial formation of an iron nitride rich nitrogen. By thermal evolution this nitride promotes the diffusion of nitrogen and the formation of other more stable nitrides. (author)

  11. Diamond synthesis at atmospheric pressure by microwave capillary plasma chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Hemawan, Kadek W.; Gou, Huiyang; Hemley, Russell J. [Geophysical Laboratory, Carnegie Institution of Washington, 5251 Broad Branch Rd., NW, Washington, DC 20015 (United States)

    2015-11-02

    Polycrystalline diamond has been synthesized on silicon substrates at atmospheric pressure, using a microwave capillary plasma chemical vapor deposition technique. The CH{sub 4}/Ar plasma was generated inside of quartz capillary tubes using 2.45 GHz microwave excitation without adding H{sub 2} into the deposition gas chemistry. Electronically excited species of CN, C{sub 2}, Ar, N{sub 2}, CH, H{sub β}, and H{sub α} were observed in the emission spectra. Raman measurements of deposited material indicate the formation of well-crystallized diamond, as evidenced by the sharp T{sub 2g} phonon at 1333 cm{sup −1} peak relative to the Raman features of graphitic carbon. Field emission scanning electron microscopy images reveal that, depending on the growth conditions, the carbon microstructures of grown films exhibit “coral” and “cauliflower-like” morphologies or well-facetted diamond crystals with grain sizes ranging from 100 nm to 10 μm.

  12. Forming method of a functional layer-built film by micro-wave plasma CVD

    Energy Technology Data Exchange (ETDEWEB)

    Saito, Keishi

    1988-11-18

    In forming an amorphous semi-conductor material film, the micro-wave plasma CVD cannot be generally used because of such demerits as film-separation, low yield, columnar structure in the film, and problems in the optical and electrical properties. In this invention, a specific substrate is placed in a layer-built film forming unit which is capable of maintaining vacuum; raw material gas for the film formation is introduced; plasma is generated by a micro-wave energy to decompose the raw material gas, thus forming the layer-built film on the substarte. Then a film is made by adding a specific amount of calcoganide-containing gas to the raw material gas. By this, the utilization efficiency of the raw material gas gets roughly 100% and both the adhesion to the substrate and the structural flexibility of the layer-built film increase, enhancing the yield of forming various functional elements (sensor, solar cell, thin transistor film, etc.), and thus greatly reducing the production cost. 6 figs., 7 tabs.

  13. Plasma-assisted molecular beam epitaxy of (11-22)-oriented 3-nitrides

    International Nuclear Information System (INIS)

    Lahourcade, L.

    2009-10-01

    This work reports on the molecular-beam epitaxial growth of (1122)-oriented semi-polar nitride semiconductors using m-sapphire substrates. The (1122) crystallographic orientation is predefined by AlN deposition on m-sapphire under N excess. On top of this AlN buffer layer, undoped or Si-doped two-dimensional GaN(1122) films are formed under Ga-rich conditions, with a stabilized Ga-excess ad-layer of about 1.05±0.10 ML. In contrast, Mg tends to segregate on the GaN surface, inhibiting the self-regulated Ga excess film. Nevertheless, uniform Mg incorporation can be obtained, and p-type conductivity was achieved. GaN/AlN quantum wells are synthesized by deposition of the binary compounds under the above-described conditions. In the case of GaN/AlN quantum dots, the three-dimensional transition is induced by a growth interruption under vacuum. The reduction of the internal electric field in GaN/AlN nano-structures is confirmed by the blue shift of the photoluminescence spectrum and by the short photoluminescence decay times measured at low temperature. These results are consistent with theoretical calculations of the electronic structure. (author)

  14. Interlayer utilization (including metal borides) for subsequent deposition of NSD films via microwave plasma CVD on 316 and 440C stainless steels

    Science.gov (United States)

    Ballinger, Jared

    . Surface boriding was implemented using the novel method of microwave plasma CVD with a mixture of hydrogen and diborane gases. On 440C bearings, dual phase boride layers of Fe2B and FeB were formed which supported adhered nanostructured diamond films. Continuity of the films was not seamless with limited regions remaining uncoated potentially corresponding to delamination of the film as evidenced by the presence of tubular structures presumably composed of sp2 bonded carbon. Surface boriding of 316 stainless steel discs was conducted at various powers and pressures to achieve temperatures ranging from 550-800 °C. The substrate boriding temperature was found to substantially influence the resultant interlayer by altering the metal boride(s) present. The lowest temperatures produced an interlayer where CrB was the single detected phase, higher temperatures yielded the presence of only Fe2B, and a combination of the two phases resulted from an intermediate boriding temperature. Compared with the more common, commercialized boriding methods, this a profound result given the problems posed by the FeB phase in addition to other advantages offered by CVD processes and microwave generated plasmas in general. Indentation testing of the boride layers revealed excellent adhesion strength for all borided interlayers, and above all, no evidence of cracking was observed for a sole Fe2B phase. As with boriding of 440C bearings, subsequent diamond deposition was achieved on these interlayers with substantially improved adhesion strength relative to diamond coated TiN interlayers. Both XRD and Raman spectroscopy confirmed a nanostructured diamond film with interfacial chromium carbides responsible for enhanced adhesion strength. Interlayers consisting solely of Fe2B have displayed an ability to support fully continuous nanostructured diamond films, yet additional study is required for consistent reproduction. This is in good agreement with initial work on pack borided high alloy steels

  15. Sulfonic acid functionalized boron nitride nanomaterials as a microwave-assisted efficient and highly biologically active one-pot synthesis of piperazinyl-quinolinyl fused Benzo[c]acridine derivatives

    Energy Technology Data Exchange (ETDEWEB)

    Murugesan, Arul; Gengan, R.M., E-mail: genganrm@dut.ac.za; Krishnan, Anand

    2017-02-15

    Boron nitride nano material based solid acid catalyst was found to be an efficient and reusable sulfonic acid catalyst for the synthesis of one-pot Knoevenagel and Michael type reactions in 3, 3-dimethyl-9-(2-(4-methylpiperazin-1-yl) quinolin-3-yl)-3, 4, 9, 10-tetrahydroacridin-1(2H)-one derivatives under microwave irradiation conditions. The catalyst was prepared by mixing boron nitrile and (3-mercaptopropyl) trimethoxysilane. This is simple and safe method for the preparation of solid acid catalysts. The morphological properties of catalyst determined by using FT-IR, XRD, TEM, SEM and Raman spectroscopy. The synthesised catalyst was employed in Knoevenagel and Michael type reactions to synthesise novel piperazinyl-quinolinyl based acridine derivatives. Furthermore the newly-synthesised compounds have been used for molecular docking in DNA binding studies. The method developed in this study has the advantages of good yield, simplicity coupled with safety and short reaction time. Most importantly it was found that the solid acid catalyst can be recycled with only 5% loss of activity. - Highlights: • One-pot Synthesis of Knoevenagel and Michel type reactions. • Synthesis of Sulfonic acid Functionalized Boron nitride nano materials. • Synthesis of piperazinyl-quinolinyl fused Benzo[c]acridine derivatives under Microwave irradiation. • Molecular docking studies were performed on piperazinyl-quinolinyl acridine derivatives using DNA.

  16. Nitriding of high speed steel

    International Nuclear Information System (INIS)

    Doyle, E.D.; Pagon, A.M.; Hubbard, P.; Dowey, S.J.; Pilkington, A.; McCulloch, D.G.; Latham, K.; DuPlessis, J.

    2010-01-01

    Current practice when nitriding HSS cutting tools is to avoid embrittlement of the cutting edge by limiting the depth of the diffusion zone. This is accomplished by reducing the nitriding time and temperature and eliminating any compound layer formation. However, in many applications there is an argument for generating a compound layer with beneficial tribological properties. In this investigation results are presented of a metallographic, XRD and XPS analysis of nitrided surface layers generated using active screen plasma nitriding and reactive vapour deposition using cathodic arc. These results are discussed in the context of built up edge formation observed while machining inside a scanning electron microscope. (author)

  17. Direct growth of hexagonal boron nitride/graphene heterostructures on cobalt foil substrates by plasma-assisted molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Xu, Zhongguang; Khanaki, Alireza; Tian, Hao; Zheng, Renjing; Suja, Mohammad; Liu, Jianlin, E-mail: jianlin@ece.ucr.edu [Quantum Structures Laboratory, Department of Electrical and Computer Engineering, University of California, Riverside, California 92521 (United States); Zheng, Jian-Guo [Irvine Materials Research Institute, University of California, Irvine, California 92697-2800 (United States)

    2016-07-25

    Graphene/hexagonal boron nitride (G/h-BN) heterostructures have attracted a great deal of attention because of their exceptional properties and wide variety of potential applications in nanoelectronics. However, direct growth of large-area, high-quality, and stacked structures in a controllable and scalable way remains challenging. In this work, we demonstrate the synthesis of h-BN/graphene (h-BN/G) heterostructures on cobalt (Co) foil by sequential deposition of graphene and h-BN layers using plasma-assisted molecular beam epitaxy. It is found that the coverage of h-BN layers can be readily controlled on the epitaxial graphene by growth time. Large-area, uniform-quality, and multi-layer h-BN films on thin graphite layers were achieved. Based on an h-BN (5–6 nm)/G (26–27 nm) heterostructure, capacitor devices with Co(foil)/G/h-BN/Co(contact) configuration were fabricated to evaluate the dielectric properties of h-BN. The measured breakdown electric field showed a high value of ∼2.5–3.2 MV/cm. Both I-V and C-V characteristics indicate that the epitaxial h-BN film has good insulating characteristics.

  18. A parametric study of the microwave plasma-assisted combustion of premixed ethylene/air mixtures

    Science.gov (United States)

    Fuh, Che A.; Wu, Wei; Wang, Chuji

    2017-11-01

    A parametric study of microwave argon plasma assisted combustion (PAC) of premixed ethylene/air mixtures was carried out using visual imaging, optical emission spectroscopy and cavity ringdown spectroscopy as diagnostic tools. The parameters investigated included the plasma feed gas flow rate, the plasma power, the fuel equivalence ratio and the total flow rate of the fuel/air mixture. The combustion enhancement effects were characterized by the minimum ignition power, the flame length and the fuel efficiency of the combustor. It was found that: (1) increasing the plasma feed gas flow rate resulted in a decrease in the flame length, an increase in the minimum ignition power for near stoichiometric fuel equivalence ratios and a corresponding decrease in the minimum ignition power for ultra-lean and rich fuel equivalence ratios; (2) at a constant plasma power, increasing the total flow rate of the ethylene/air mixture from 1.0 slm to 1.5 slm resulted in an increase in the flame length and a reduction in the fuel efficiency; (3) increasing the plasma power resulted in a slight increase in flame length as well as improved fuel efficiency with fewer C2(d) and CH(A) radicals present downstream of the flame; (4) increasing the fuel equivalence ratio caused an increase in flame length but at a reduced fuel efficiency when plasma power was kept constant; and (5) the ground state OH(X) number density was on the order of 1015 molecules/cm3 and was observed to drop downstream along the propagation axis of the flame at all parameters investigated. Results suggest that each of the parameters independently influences the PAC processes.

  19. Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system

    Czech Academy of Sciences Publication Activity Database

    Potocký, Štěpán; Babchenko, Oleg; Davydova, Marina; Ižák, Tibor; Čada, Martin; Kromka, Alexander

    2014-01-01

    Roč. 53, č. 5 (2014), "05FP04-1"-"05FP04-3" ISSN 0021-4922 R&D Projects: GA TA ČR TA01011740; GA ČR GAP205/12/0908 Grant - others:AVČR(CZ) M100100902 Institutional support: RVO:68378271 Keywords : antenna linear * CVD system * plasma Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 1.127, year: 2014

  20. Low-temperature ({<=}200 Degree-Sign C) plasma enhanced atomic layer deposition of dense titanium nitride thin films

    Energy Technology Data Exchange (ETDEWEB)

    Samal, Nigamananda; Du Hui; Luberoff, Russell; Chetry, Krishna; Bubber, Randhir; Hayes, Alan; Devasahayam, Adrian [Veeco Instruments, 1 Terminal Drive, Plainview, New York 11803 (United States)

    2013-01-15

    Titanium nitride (TiN) has been widely used in the semiconductor industry for its diffusion barrier and seed layer properties. However, it has seen limited adoption in other industries in which low temperature (<200 Degree-Sign C) deposition is a requirement. Examples of applications which require low temperature deposition are seed layers for magnetic materials in the data storage (DS) industry and seed and diffusion barrier layers for through-silicon-vias (TSV) in the MEMS industry. This paper describes a low temperature TiN process with appropriate electrical, chemical, and structural properties based on plasma enhanced atomic layer deposition method that is suitable for the DS and MEMS industries. It uses tetrakis-(dimethylamino)-titanium as an organometallic precursor and hydrogen (H{sub 2}) as co-reactant. This process was developed in a Veeco NEXUS Trade-Mark-Sign chemical vapor deposition tool. The tool uses a substrate rf-biased configuration with a grounded gas shower head. In this paper, the complimentary and self-limiting character of this process is demonstrated. The effects of key processing parameters including temperature, pulse time, and plasma power are investigated in terms of growth rate, stress, crystal morphology, chemical, electrical, and optical properties. Stoichiometric thin films with growth rates of 0.4-0.5 A/cycle were achieved. Low electrical resistivity (<300 {mu}{Omega} cm), high mass density (>4 g/cm{sup 3}), low stress (<250 MPa), and >85% step coverage for aspect ratio of 10:1 were realized. Wet chemical etch data show robust chemical stability of the film. The properties of the film have been optimized to satisfy industrial viability as a Ruthenium (Ru) preseed liner in potential data storage and TSV applications.

  1. Microwave plasma induced surface modification of diamond-like carbon films

    Science.gov (United States)

    Rao Polaki, Shyamala; Kumar, Niranjan; Gopala Krishna, Nanda; Madapu, Kishore; Kamruddin, Mohamed; Dash, Sitaram; Tyagi, Ashok Kumar

    2017-12-01

    Tailoring the surface of diamond-like carbon (DLC) film is technically relevant for altering the physical and chemical properties, desirable for useful applications. A physically smooth and sp3 dominated DLC film with tetrahedral coordination was prepared by plasma-enhanced chemical vapor deposition technique. The surface of the DLC film was exposed to hydrogen, oxygen and nitrogen plasma for physical and chemical modifications. The surface modification was based on the concept of adsorption-desorption of plasma species and surface entities of films. Energetic chemical species of microwave plasma are adsorbed, leading to desorbtion of the surface carbon atoms due to energy and momentum exchange. The interaction of such reactive species with DLC films enhanced the roughness, surface defects and dangling bonds of carbon atoms. Adsorbed hydrogen, oxygen and nitrogen formed a covalent network while saturating the dangling carbon bonds around the tetrahedral sp3 valency. The modified surface chemical affinity depends upon the charge carriers and electron covalency of the adsorbed atoms. The contact angle of chemically reconstructed surface increases when a water droplet interacts either through hydrogen or van dear Waals bonding. These weak interactions influenced the wetting property of the DLC surface to a great extent.

  2. Microwave atmospheric pressure plasma jets for wastewater treatment: Degradation of methylene blue as a model dye.

    Science.gov (United States)

    García, María C; Mora, Manuel; Esquivel, Dolores; Foster, John E; Rodero, Antonio; Jiménez-Sanchidrián, César; Romero-Salguero, Francisco J

    2017-08-01

    The degradation of methylene blue in aqueous solution as a model dye using a non thermal microwave (2.45 GHz) plasma jet at atmospheric pressure has been investigated. Argon has been used as feed gas and aqueous solutions with different concentrations of the dye were treated using the effluent from plasma jet in a remote exposure. The removal efficiency increased as the dye concentration decreased from 250 to 5 ppm. Methylene blue degrades after different treatment times, depending on the experimental plasma conditions. Thus, kinetic constants up to 0.177 min -1 were obtained. The higher the Ar flow, the faster the degradation rate. Optical emission spectroscopy (OES) was used to gather information about the species present in the gas phase, specifically excited argon atoms. Argon excited species and hydrogen peroxide play an important role in the degradation of the dye. In fact, the conversion of methylene blue was directly related to the density of argon excited species in the gas phase and the concentration of hydrogen peroxide in the aqueous liquid phase. Values of energy yield at 50% dye conversion of 0.296 g/kWh were achieved. Also, the use of two plasma applicators in parallel has been proven to improve energy efficiency. Copyright © 2017 Elsevier Ltd. All rights reserved.

  3. Spectroscopic investigations of plasma nitriding processes: A comparative study using steel and carbon as active screen materials

    Science.gov (United States)

    Hamann, S.; Burlacov, I.; Spies, H.-J.; Biermann, H.; Röpcke, J.

    2017-04-01

    Low-pressure pulsed DC H2-N2 plasmas were investigated in the laboratory active screen plasma nitriding monitoring reactor, PLANIMOR, to compare the usage of two different active screen electrodes: (i) a steel screen with the additional usage of CH4 as carbon containing precursor in the feeding gas and (ii) a carbon screen without the usage of any additional gaseous carbon precursor. Applying the quantum cascade laser absorption spectroscopy, the evolution of the concentration of four stable molecular species, NH3, HCN, CH4, and C2H2, has been monitored. The concentrations were found to be in a range of 1012-1016 molecules cm-3. By analyzing the development of the molecular concentrations at variations of the screen plasma power, a similar behavior of the monitored reaction products has been found for both screen materials, with NH3 and HCN as the main reaction products. When using the carbon screen, the concentration of HCN and C2H2 was 30 and 70 times higher, respectively, compared to the usage of the steel screen with an admixture of 1% CH4. Considering the concentration of the three detected hydrocarbon reaction products, a combustion rate of the carbon screen of up to 69 mg h-1 has been found. The applied optical emission spectroscopy enabled the determination of the rotational temperature of the N2+ ion which has been in a range of 650-900 K increasing with the power in a similar way in the plasma of both screens. Also with power the ionic component of nitrogen molecules, represented by the N2+ (0-0) band of the first negative system, as well as the CN (0-0) band of the violet system increase strongly in relation to the intensity of the neutral nitrogen component, i.e., the N2 (0-0) band of the second positive system. In addition, steel samples have been treated with both the steel and the carbon screen resulting in a formation of a compound layer of up to 10 wt. % nitrogen and 10 wt. % carbon, respectively, depending on the screen material.

  4. An evaluation of microwave-assisted fusion and microwave-assisted acid digestion methods for determining elemental impurities in carbon nanostructures using inductively coupled plasma optical emission spectrometry

    KAUST Repository

    Patole, Shashikant P.

    2015-10-21

    It is common for as-prepared carbon nanotube (CNT) and graphene samples to contain remnants of the transition metals used to catalyze their growth; contamination may also leave other trace elemental impurities in the samples. Although a full quantification of impurities in as-prepared samples of carbon nanostructures is difficult, particularly when trace elements are intercalated or encapsulated within a protective layer of graphitic carbon, reliable information is essential for reasons such as quantifying the adulteration of physico-chemical properties of the materials and for evaluating environmental issues. Here, we introduce a microwave-based fusion method to degrade single- and double-walled CNTs and graphene nanoplatelets into a fusion flux thereby thoroughly leaching all metallic impurities. Subsequent dissolution of the fusion product in diluted hydrochloric and nitric acid allowed us to identify their trace elemental impurities using inductively coupled plasma optical emission spectrometry. Comparisons of the results from the proposed microwave-assisted fusion method against those of a more classical microwave-assisted acid digestion approach suggest complementarity between the two that ultimately could lead to a more reliable and less costly determination of trace elemental impurities in carbon nanostructured materials. Graphical abstract A method for the complete digestion of carbon nanostructures has been demonstrated. Photographs (on the left side) show zirconium crucibles containing SWCNTs with flux of Na2CO3 and K2CO3, before and after microwave fusion; (on the right side) the appearance of the final solutions containing dissolved samples, from microwave-assisted fusion and microwave-assisted acid digestion. These solutions were used for determining the trace elemental impurities by ICP‒OES.

  5. Treatment of airborne asbestos and asbestos-like microfiber particles using atmospheric microwave air plasma

    Energy Technology Data Exchange (ETDEWEB)

    Averroes, A., E-mail: aulia.a.aa@m.titech.ac.jp [Department of Chemical Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552 (Japan); Sekiguchi, H. [Department of Chemical Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552 (Japan); Sakamoto, K. [Street Design Corporation, 6-9-30 Shimo odanaka, Kawasaki-shi, Kanagawa 211-0041 (Japan)

    2011-11-15

    Highlights: {yields} We use atmospheric microwave air plasma to treat ceramic fiber and stainless fiber as asbestos alike micro fiber particle. {yields} Spheroidization of certain type of ceramic fiber and stainless fiber particle. {yields} The evaluation of the treated particles by the fiber vanishing rate. {yields} Good fiber vanishing rate is observed for fiber particle with diameter below 10 {mu}m. {yields} The treatment of pure asbestos and a suggestion of the use of this method for the treatment airborne asbestos. - Abstract: Atmospheric microwave air plasma was used to treat asbestos-like microfiber particles that had two types of ceramic fiber and one type of stainless fiber. The treated particles were characterized via scanning electron microscopy (SEM) and X-ray diffraction (XRD). The experiment results showed that one type of ceramic fiber (Alumina:Silica = 1:1) and the stainless fiber were spheroidized, but the other type of ceramic fiber (Alumina:Silica = 7:3) was not. The conversion of the fibers was investigated by calculating the equivalent diameter, the aspect ratio, and the fiber content ratio. The fiber content ratio in various conditions showed values near zero. The relationship between the normalized fiber vanishing rate and the energy needed to melt the particles completely per unit surface area of projected particles, which is defined as {eta}, was examined and seen to indicate that the normalized fiber vanishing rate decreased rapidly with the increase in {eta}. Finally, some preliminary experiments for pure asbestos were conducted, and the analysis via XRD and phase-contrast microscopy (PCM) showed the availability of the plasma treatment.

  6. Treatment of airborne asbestos and asbestos-like microfiber particles using atmospheric microwave air plasma

    International Nuclear Information System (INIS)

    Averroes, A.; Sekiguchi, H.; Sakamoto, K.

    2011-01-01

    Highlights: → We use atmospheric microwave air plasma to treat ceramic fiber and stainless fiber as asbestos alike micro fiber particle. → Spheroidization of certain type of ceramic fiber and stainless fiber particle. → The evaluation of the treated particles by the fiber vanishing rate. → Good fiber vanishing rate is observed for fiber particle with diameter below 10 μm. → The treatment of pure asbestos and a suggestion of the use of this method for the treatment airborne asbestos. - Abstract: Atmospheric microwave air plasma was used to treat asbestos-like microfiber particles that had two types of ceramic fiber and one type of stainless fiber. The treated particles were characterized via scanning electron microscopy (SEM) and X-ray diffraction (XRD). The experiment results showed that one type of ceramic fiber (Alumina:Silica = 1:1) and the stainless fiber were spheroidized, but the other type of ceramic fiber (Alumina:Silica = 7:3) was not. The conversion of the fibers was investigated by calculating the equivalent diameter, the aspect ratio, and the fiber content ratio. The fiber content ratio in various conditions showed values near zero. The relationship between the normalized fiber vanishing rate and the energy needed to melt the particles completely per unit surface area of projected particles, which is defined as η, was examined and seen to indicate that the normalized fiber vanishing rate decreased rapidly with the increase in η. Finally, some preliminary experiments for pure asbestos were conducted, and the analysis via XRD and phase-contrast microscopy (PCM) showed the availability of the plasma treatment.

  7. Correlation of morphology and barrier properties of thin microwave plasma polymer films on metal substrate

    International Nuclear Information System (INIS)

    Barranco, V.; Carpentier, J.; Grundmeier, G.

    2004-01-01

    The barrier properties of thin model organosilicon plasma polymers layers on iron are characterised by means of electrochemical impedance spectroscopy (EIS). Tailored thin plasma polymers of controlled morphology and chemical composition were deposited from a microwave discharge. By the analysis of the obtained impedance diagrams, the evolution of the water uptake φ, coating resistance and polymer capacitance with immersion time were monitored and the diffusion coefficients of the water through the films were calculated. The impedance data correlated well with the chemical structure and morphology of the plasma polymer films with a thickness of less than 100 nm. The composition of the films were determined by means of infrared reflection absorption spectroscopy (IRRAS), X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS). The morphology of the plasma polymer surface and the interface between the plasma polymer and the metal were characterised using atomic force microscopy (AFM). It could be shown that, at higher pressure, the film roughness increases which is probably due to the adsorption of plasma polymer nanoparticles formed in the plasma bulk and the faster film growth. This leads to voids with a size of a few tens of nanometers at the polymer/metal interface. The film roughness increases from the interface to the outer surface of the film. By lowering the pressure and thereby slowing the deposition rate, the plasma polymers perfectly imitate the substrate topography and lead to an excellent blocking of the metal surface. Moreover, the ratio of siloxane bonds to methyl-silyl groups increases which implies that the crosslink density is higher at lower deposition rate. The EIS data consistently showed higher coating resistance as well as lower interfacial capacitance values and a better stability over time for the film deposited at slower pressure. The diffusion coefficient of water in thin and ultra-thin plasma

  8. Optical emission spectroscopy for quantification of ultraviolet radiations and biocide active species in microwave argon plasma jet at atmospheric pressure

    Energy Technology Data Exchange (ETDEWEB)

    Wattieaux, G., E-mail: gaetan.wattieaux@laplace.univ-tlse.fr; Yousfi, M.; Merbahi, N.

    2013-11-01

    This work deals with absorption and mainly emission spectrometry of a microwave induced surfatron plasma jet launched in ambient air and using an Argon flow carrier gas. The Ar flow rate varies between 1 and 3 L/min and the microwave power between 40 and 60 W. The analysis of the various spectra has led to the determination of the ozone and atomic oxygen concentrations, ultraviolet (UV) irradiance separating UVA, UVB and UVC, gas temperature, plasma electron density and excitation temperature. Most of these diagnostics are spatially resolved along the plasma jet axis. It is shown more particularly that rotational temperature obtained from OH(A-X) spectra ranges between 800 K to 1000 K while the apparent temperature of the plasma jet remains lower than about 325 K which is compatible with biocide treatment without significant thermal effect. The electron density reaches 1.2 × 10{sup 14} cm{sup −3}, the excitation temperature is about 4000 K, the UVC radiation represents only 5% of the UV radiations emitted by the device, the ozone concentration is found to reach 88 ± 27 ppm in the downstream part of the plasma jet at a distance of 30 mm away from the quartz tube outlet of the surfatron and the atomic oxygen concentration lies between 10 and 80 ppm up to a distance of 20 mm away from the quartz tube outlet. Ozone is identified as the main germicidal active species produced by the device since its concentration is in accordance with bacteria inactivation durations usually reported using such plasma devices. Human health hazard assessment is carried out all along this study since simple solutions are reminded to respect safety standards for exposures to ozone and microwave leakage. In this study, an air extraction unit is used and a Faraday cage is set around the quartz tube of the surfatron and the plasma jet. These solutions should be adopted by users of microwave induced plasma in open air conditions because according to the literature, this is not often the

  9. Optical emission spectroscopy for quantification of ultraviolet radiations and biocide active species in microwave argon plasma jet at atmospheric pressure

    International Nuclear Information System (INIS)

    Wattieaux, G.; Yousfi, M.; Merbahi, N.

    2013-01-01

    This work deals with absorption and mainly emission spectrometry of a microwave induced surfatron plasma jet launched in ambient air and using an Argon flow carrier gas. The Ar flow rate varies between 1 and 3 L/min and the microwave power between 40 and 60 W. The analysis of the various spectra has led to the determination of the ozone and atomic oxygen concentrations, ultraviolet (UV) irradiance separating UVA, UVB and UVC, gas temperature, plasma electron density and excitation temperature. Most of these diagnostics are spatially resolved along the plasma jet axis. It is shown more particularly that rotational temperature obtained from OH(A-X) spectra ranges between 800 K to 1000 K while the apparent temperature of the plasma jet remains lower than about 325 K which is compatible with biocide treatment without significant thermal effect. The electron density reaches 1.2 × 10 14 cm −3 , the excitation temperature is about 4000 K, the UVC radiation represents only 5% of the UV radiations emitted by the device, the ozone concentration is found to reach 88 ± 27 ppm in the downstream part of the plasma jet at a distance of 30 mm away from the quartz tube outlet of the surfatron and the atomic oxygen concentration lies between 10 and 80 ppm up to a distance of 20 mm away from the quartz tube outlet. Ozone is identified as the main germicidal active species produced by the device since its concentration is in accordance with bacteria inactivation durations usually reported using such plasma devices. Human health hazard assessment is carried out all along this study since simple solutions are reminded to respect safety standards for exposures to ozone and microwave leakage. In this study, an air extraction unit is used and a Faraday cage is set around the quartz tube of the surfatron and the plasma jet. These solutions should be adopted by users of microwave induced plasma in open air conditions because according to the literature, this is not often the case

  10. Hollow-anode plasma source for molecular beam epitaxy of gallium nitride

    International Nuclear Information System (INIS)

    Anders, A.; Newman, N.; Rubin, M.; Dickinson, M.; Jones, E.; Phatak, P.; Gassmann, A.

    1996-01-01

    GaN films have been grown by molecular beam epitaxy (MBE) using a hollow-anode nitrogen plasma source. The source was developed to minimize defect formation as a result of contamination and ion damage. The hollow-anode discharge is a special form of glow discharge with very small anode area. A positive anode voltage drop of 30 endash 40 V and an increased anode sheath thickness leads to ignition of a relatively dense plasma in front of the anode hole. Driven by the pressure gradient, the open-quote open-quote anode close-quote close-quote plasma forms a bright plasma jet streaming with supersonic velocity towards the substrate. Films of GaN have been grown on (0001) SiC and (0001) Al 2 O 3 at 600 endash 800 degree C. The films were investigated by photoluminescence, cathodoluminescence, x-ray diffraction, Rutherford backscattering, and particle-induced x-ray emission. The film with the highest structural quality had a rocking curve width of 5 arcmin, the lowest reported value for MBE growth to date. copyright 1996 American Institute of Physics

  11. Plasma nitriding induced growth of Pt-nanowire arrays as high performance electrocatalysts for fuel cells

    NARCIS (Netherlands)

    Du, S.; Lin, K.; Malladi, S.R.K.; Lu, Y.; Sun, S.; Xu, Q.; Steinberger-Wilckens, R.; Dong, H.

    2014-01-01

    In this work, we demonstrate an innovative approach, combing a novel active screen plasma (ASP) technique with green chemical synthesis, for a direct fabrication of uniform Pt nanowire arrays on large-area supports. The ASP treatment enables in-situ N-doping and surface modification to the support

  12. Multichannel microwave interferometer with an antenna switching system for electron density measurement in a laboratory plasma experiment

    Energy Technology Data Exchange (ETDEWEB)

    Kawamori, Eiichirou; Lin, Yu-Hsiang [Institute of Space and Plasma Sciences, National Cheng Kung University, Tainan 70101, Taiwan (China); Mase, Atsushi [Art, Science and Technology Center for Cooperative Research, Kyushu University, Kasuga 816-8580 (Japan); Nishida, Yasushi; Cheng, C. Z. [Institute of Space and Plasma Sciences, National Cheng Kung University, Tainan 70101, Taiwan (China); Plasma and Space Science Center, National Cheng Kung University, Tainan 70101, Taiwan (China)

    2014-02-15

    This study presents a simple and powerful technique for multichannel measurements of the density profile in laboratory plasmas by microwave interferometry. This technique uses electromechanical microwave switches to temporally switch the connection between multiple receiver antennas and one phase-detection circuit. Using this method, the phase information detected at different positions is rearranged into a time series that can be acquired from a minimum number of data acquisition channels (e.g., two channels in the case of quadrature detection). Our successfully developed multichannel microwave interferometer that uses the antenna switching method was applied to measure the radial electron density profiles in a magnetized plasma experiment. The advantage of the proposed method is its compactness and scalability to multidimensional measurement systems at low cost.

  13. Convective model of a microwave discharge in a gas at atmospheric pressure in the form of a spatially localized plasma

    International Nuclear Information System (INIS)

    Skovoroda, A.A.

    1997-01-01

    Experiments and a theoretical model consistent with them are presented which show that a stationary microwave discharge in a gas at atmospheric pressure under the action of free convection due to the action of the buoyant force on the heated air can be spatially localized, taking a spheroidal shape. Vortex motion inside the spheroid gives this localized plasma formation some of the properties of a material body which are manifested in a distinct material isolation from the surrounding space, in the formation of a narrow thermal boundary layer and flow separation, and in the formation of secondary vortices in the wake region. The characteristic radius of the stationary localized plasma is governed mainly by the wavelength of the microwave radiation a∼0.137λ. Energy balance is established to a significant degree by convective cooling of the microwave-heated structure

  14. Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma

    Science.gov (United States)

    Miyawaki, Yudai; Shibata, Emi; Kondo, Yusuke; Takeda, Keigo; Kondo, Hiroki; Ishikawa, Kenji; Okamoto, Hidekazu; Sekine, Makoto; Hori, Masaru

    2013-02-01

    The etching rates of low-dielectric-constant (low-k), porous SiOCH (p-SiOCH) films were increased by nitrogen-added Ar/C5F10O plasma etching in dual-frequency (60 MHz/2 MHz)-excited parallel plate capacitively coupled plasma. Previously, perfluoropropyl vinyl ether [C5F10O] provided a very high density of CF3+ ions [Nagai et al.: Jpn. J. Appl. Phys. 45 (2006) 7100]. Surface nitridation on the p-SiOCH surface exposed to Ar/N2 plasma led to the etching of larger amounts of p-SiOCH in Ar/C5F10O plasma, which depended on the formation of bonds such as =C(sp2)=N(sp2)- and -C(sp)≡N(sp).

  15. Modeling of electron behaviors under microwave electric field in methane and air pre-mixture gas plasma assisted combustion

    Science.gov (United States)

    Akashi, Haruaki; Sasaki, K.; Yoshinaga, T.

    2011-10-01

    Recently, plasma-assisted combustion has been focused on for achieving more efficient combustion way of fossil fuels, reducing pollutants and so on. Shinohara et al has reported that the flame length of methane and air premixed burner shortened by irradiating microwave power without increase of gas temperature. This suggests that electrons heated by microwave electric field assist the combustion. They also measured emission from 2nd Positive Band System (2nd PBS) of nitrogen during the irradiation. To clarify this mechanism, electron behavior under microwave power should be examined. To obtain electron transport parameters, electron Monte Carlo simulations in methane and air mixture gas have been done. A simple model has been developed to simulate inside the flame. To make this model simple, some assumptions are made. The electrons diffuse from the combustion plasma region. And the electrons quickly reach their equilibrium state. And it is found that the simulated emission from 2nd PBS agrees with the experimental result. Recently, plasma-assisted combustion has been focused on for achieving more efficient combustion way of fossil fuels, reducing pollutants and so on. Shinohara et al has reported that the flame length of methane and air premixed burner shortened by irradiating microwave power without increase of gas temperature. This suggests that electrons heated by microwave electric field assist the combustion. They also measured emission from 2nd Positive Band System (2nd PBS) of nitrogen during the irradiation. To clarify this mechanism, electron behavior under microwave power should be examined. To obtain electron transport parameters, electron Monte Carlo simulations in methane and air mixture gas have been done. A simple model has been developed to simulate inside the flame. To make this model simple, some assumptions are made. The electrons diffuse from the combustion plasma region. And the electrons quickly reach their equilibrium state. And it is found

  16. Two-Dimensional Modeling of Aluminum Gallium Nitride/Gallium Nitride High Electron Mobility Transistor

    National Research Council Canada - National Science Library

    Holmes, Kenneth

    2002-01-01

    Gallium Nitride (GaN) High Electron Mobility Transistors (HEMT's) are microwave power devices that have the performance characteristics to improve the capabilities of current and future Navy radar and communication systems...

  17. Study creep in 4340 steels with different microstructure and plasma carbon nitridation processing

    International Nuclear Information System (INIS)

    Abdalla, A.J.; Carrer, I.R.; Barboza, M.J.R.; Baggio-Scheid, V.H.; Moura Neto, C.; Reis, D.A.P.

    2010-01-01

    From the AISI 4340 bars specimens were made-for-test of creep, they were subjected to different heat treatments for the formation of multiphase microstructures. After this initial treatment, a lot of the specimens were tested in creep. One second batch of specimens was treated with a plasma carbonitriding, and later, were also tested. The carbonitriding layer and microstructure were characterized with X-ray analysis, laser confocal microscopy and hardness testing. Tests showed that the hardness in the steel was reduced due to thermochemical treatment at 500 deg C. We observed variation in creep behavior due to different microstructures formed. After the plasma treatment, there was a considerable reduction in the rate of creep and an increase in the time required for fracture. (author)

  18. Influence of fast waves on the collective scattering of microwaves in fusion plasmas

    International Nuclear Information System (INIS)

    Chiu, S.C.

    1992-01-01

    Microwave scattering by the fluctuations of fusion plasmas is one of the most promising α-diagnostic techniques. Previous investigations have concentrated on the fluctuations near the slow wave branch in the lower hybrid range of frequencies. The small signal and the lack of sensitivity to the contribution of α-particles to the total cross-section near the slow branch severely limits the effectiveness of this technique. In this paper, we report results of investigations of scattering by fluctuations in the lower hybrid range of frequencies near the fast branch. Surprisingly, when both fast and slow branches exist, the scattering amplitudes are comparable. More important, the α-contribution is larger for the fast branch and the fast branch has a larger parameter space where it exists. Specifically, the slow branch exists only above the lower hybrid frequency, while the fast branch can exist at all frequencies up to the electron cyclotron range of frequencies. We find numerically that the scattering amplitudes near the fast branch below the lower hybrid frequency are several orders of magnitude larger than those near the slow branch above that frequency where it can exist. This may make microwave scattering by fast waves a more attractive α-diagnostic technique. (orig.)

  19. Microwave plasma-assisted chemical vapor deposition of porous carbon film as supercapacitive electrodes

    Science.gov (United States)

    Wu, Ai-Min; Feng, Chen-Chen; Huang, Hao; Paredes Camacho, Ramon Alberto; Gao, Song; Lei, Ming-Kai; Cao, Guo-Zhong

    2017-07-01

    Highly porous carbon film (PCF) coated on nickel foam was prepared successfully by microwave plasma-assisted chemical vapor deposition (MPCVD) with C2H2 as carbon source and Ar as discharge gas. The PCF is uniform and dense with 3D-crosslinked nanoscale network structure possessing high degree of graphitization. When used as the electrode material in an electrochemical supercapacitor, the PCF samples verify their advantageous electrical conductivity, ion contact and electrochemical stability. The test results show that the sample prepared under 1000 W microwave power has good electrochemical performance. It displays the specific capacitance of 62.75 F/g at the current density of 2.0 A/g and retains 95% of its capacitance after 10,000 cycles at the current density of 2.0 A/g. Besides, its near-rectangular shape of the cyclic voltammograms (CV) curves exhibits typical character of an electric double-layer capacitor, which owns an enhanced ionic diffusion that can fit the requirements for energy storage applications.

  20. Microwave plasma synthesis of Si/Ge and Si/WSi2 nanoparticles for thermoelectric applications

    Science.gov (United States)

    Petermann, Nils; Schneider, Tom; Stötzel, Julia; Stein, Niklas; Weise, Claudia; Wlokas, Irenäus; Schierning, Gabi; Wiggers, Hartmut

    2015-08-01

    The utilization of microwave-based plasma systems enables a contamination-free synthesis of highly specific nanoparticles in the gas phase. A reactor setup allowing stable, long-term operation was developed with the support of computational fluid dynamics. This paper highlights the prospects of gas-phase plasma synthesis to produce specific materials for bulk thermoelectrics. Taking advantage of specific plasma reactor properties such as Coulomb repulsion in combination with gas temperatures considerably higher than 1000 K, spherical and non-aggregated nanoparticles of multiple compositions are accessible. Different strategies towards various nanostructured composites and alloys are discussed. It is shown that, based on doped silicon/germanium alloys and composites, thermoelectric materials with zT values up to almost unity can be synthesized in one step. First experimental results concerning silicon/tungsten silicide thermoelectrics applying the nanoparticle-in-alloy idea are presented indicating that this concept might work. However, it is found that tungsten silicides show a surprising sinter activity more than 1000 K below their melting temperature.

  1. Simulation of cold magnetized plasmas with the 3D electromagnetic software CST Microwave Studio®

    Directory of Open Access Journals (Sweden)

    Louche Fabrice

    2017-01-01

    Full Text Available Detailed designs of ICRF antennas were made possible by the development of sophisticated commercial 3D codes like CST Microwave Studio® (MWS. This program allows for very detailed geometries of the radiating structures, but was only considering simple materials like equivalent isotropic dielectrics to simulate the reflection and the refraction of RF waves at the vacuum/plasma interface. The code was nevertheless used intensively, notably for computing the coupling properties of the ITER ICRF antenna. Until recently it was not possible to simulate gyrotropic medias like magnetized plasmas, but recent improvements have allowed programming any material described by a general dielectric or/and diamagnetic tensor. A Visual Basic macro was developed to exploit this feature and was tested for the specific case of a monochromatic plane wave propagating longitudinally with respect to the magnetic field direction. For specific cases the exact solution can be expressed in 1D as the sum of two circularly polarized waves connected by a reflection coefficient that can be analytically computed. Solutions for stratified media can also be derived. This allows for a direct comparison with MWS results. The agreement is excellent but accurate simulations for realistic geometries require large memory resources that could significantly restrict the possibility of simulating cold plasmas to small-scale machines.

  2. Simulation of cold magnetized plasmas with the 3D electromagnetic software CST Microwave Studio®

    Science.gov (United States)

    Louche, Fabrice; Křivská, Alena; Messiaen, André; Wauters, Tom

    2017-10-01

    Detailed designs of ICRF antennas were made possible by the development of sophisticated commercial 3D codes like CST Microwave Studio® (MWS). This program allows for very detailed geometries of the radiating structures, but was only considering simple materials like equivalent isotropic dielectrics to simulate the reflection and the refraction of RF waves at the vacuum/plasma interface. The code was nevertheless used intensively, notably for computing the coupling properties of the ITER ICRF antenna. Until recently it was not possible to simulate gyrotropic medias like magnetized plasmas, but recent improvements have allowed programming any material described by a general dielectric or/and diamagnetic tensor. A Visual Basic macro was developed to exploit this feature and was tested for the specific case of a monochromatic plane wave propagating longitudinally with respect to the magnetic field direction. For specific cases the exact solution can be expressed in 1D as the sum of two circularly polarized waves connected by a reflection coefficient that can be analytically computed. Solutions for stratified media can also be derived. This allows for a direct comparison with MWS results. The agreement is excellent but accurate simulations for realistic geometries require large memory resources that could significantly restrict the possibility of simulating cold plasmas to small-scale machines.

  3. Microwave plasma initiated graft copolymerization modification of monomers onto PTFE surface

    International Nuclear Information System (INIS)

    Guan Weishu; Wen Yunjian; Fang Yan; Yin Yongxiang

    1996-02-01

    A graft copolymerization modification technique of monomers onto polytetrafluoroethylene (PTFE) surface initiated by a 2.45 GHz non-equilibrium microwave plasma has been investigated. Standard X-Ray Photoelectron Spectroscopy (XPS), Attenuated Total Reflectance-Fourier Transform Infrared Spectroscopy (ATR-FTIR), Scanning Electron Microscopy (sEM) and wetting techniques were used for examination and analysis of samples. Considerable changes in chemical structure, composition and in morphology of grafted surface of PTFE were found. Results showed the occurrence of noticeable defluorination and cross-linked structure on grafted surface, and indicated that different kinds and contents of oxygen-containing functional groups were introduced into the surface of PTFE. Wetting and adhesion experiment of the sample proved that significant improvements in hydrophilicity and adhesion of surface were exhibited. These results confirmed the success of grafting. (8 refs., 7 figs., 1 tab.)

  4. Low-temperature synthesis of graphene on nickel foil by microwave plasma chemical vapor deposition

    International Nuclear Information System (INIS)

    Kim, Y.; Song, W.; Lee, S. Y.; Jeon, C.; Jung, W.; Kim, M.; Park, C.-Y.

    2011-01-01

    Microwave plasma chemical vapor deposition (MPCVD) was employed to synthesize high quality centimeter scale graphene film at low temperatures. Monolayer graphene was obtained by varying the gas mixing ratio of hydrogen and methane to 80:1. Using advantages of MPCVD, the synthesis temperature was decreased from 750 deg. C down to 450 deg. C. Optical microscopy and Raman mapping images exhibited that a large area monolayer graphene was synthesized regardless of the temperatures. Since the overall transparency of 89% and low sheet resistances ranging from 590 to 1855 Ω/sq of graphene films were achieved at considerably low synthesis temperatures, MPCVD can be adopted in manufacturing future large-area electronic devices based on graphene film.

  5. Low-temperature synthesis of graphene on nickel foil by microwave plasma chemical vapor deposition

    Science.gov (United States)

    Kim, Y.; Song, W.; Lee, S. Y.; Jeon, C.; Jung, W.; Kim, M.; Park, C.-Y.

    2011-06-01

    Microwave plasma chemical vapor deposition (MPCVD) was employed to synthesize high quality centimeter scale graphene film at low temperatures. Monolayer graphene was obtained by varying the gas mixing ratio of hydrogen and methane to 80:1. Using advantages of MPCVD, the synthesis temperature was decreased from 750 °C down to 450 °C. Optical microscopy and Raman mapping images exhibited that a large area monolayer graphene was synthesized regardless of the temperatures. Since the overall transparency of 89% and low sheet resistances ranging from 590 to 1855 Ω/sq of graphene films were achieved at considerably low synthesis temperatures, MPCVD can be adopted in manufacturing future large-area electronic devices based on graphene film.

  6. Structured nanocarbon on various metal foils by microwave plasma enhanced chemical vapor deposition

    International Nuclear Information System (INIS)

    Rius, G; Yoshimura, M

    2013-01-01

    We present a versatile process for the engineering of nanostructures made of crystalline carbon on metal foils. The single step process by microwave plasma-enhance chemical vapor deposition is demonstrated for various substrate materials, such as Ni or Cu. Either carbon nanotubes (CNT) or carbon nanowalls (CNW) are obtained under same growth conditions and without the need of additional catalyst. The use of spacer and insulator implies a certain control over the kind of allotropes that are obtained. High density and large surface area are morphological characteristics of the thus obtained C products. The possibility of application on many metals, and in the alloy composition, on as-delivered commercially available foils indicates that this strategy can be adapted to a bunch of specific applications, while the production of C nanostructures is of remarkable simplicity.

  7. High-Power Plasma Switch for 11.4 GHz Microwave Pulse Compressor

    International Nuclear Information System (INIS)

    Hirshfield, Jay L.

    2010-01-01

    Results obtained in several experiments on active RF pulse compression at X-band using a magnicon as the high-power RF source are presented. In these experiments, microwave energy was stored in high-Q TE01 and TE02 modes of two parallel-fed resonators, and then discharged using switches activated with rapidly fired plasma discharge tubes. Designs and high-power tests of several versions of the compressor are described. In these experiments, coherent pulse superposition was demonstrated at a 5-9 MW level of incident power. The compressed pulses observed had powers of 50-70 MW and durations of 40-70 ns. Peak power gains were measured to be in the range of 7:1-11:1 with efficiency in the range of 50-63%.

  8. High-power microwave transmission systems for electron cyclotron resonance plasma heating

    International Nuclear Information System (INIS)

    Vernon, R.J.

    1990-08-01

    This progress report is for the fifth year of a grant from the US Department of Energy (Contract FG02-85ER52122) for the design, development, and fabrication of ECRF transmission and mode conversion systems to transport microwave power from a gyrotron, or other high power source, to a magnetically confined plasma. (This period is also the second year covered by a three-year renewal proposal submitted in June of 1988.) The development of new and improved components for such systems and underlying theory, where necessary, is the focus of this project. Devising and improving component testing and diagnostic techniques is also an important part of this effort. The development of possible designs for sections of gyrotrons themselves, such as tapers or Vlasov-type launchers, in support of the Varian gyrotron development program is also considered in this work

  9. Morphology and structure of Ti-doped diamond films prepared by microwave plasma chemical vapor deposition

    Science.gov (United States)

    Liu, Xuejie; Lu, Pengfei; Wang, Hongchao; Ren, Yuan; Tan, Xin; Sun, Shiyang; Jia, Huiling

    2018-06-01

    Ti-doped diamond films were deposited through a microwave plasma chemical vapor deposition (MPCVD) system for the first time. The effects of the addition of Ti on the morphology, microstructure and quality of diamond films were systematically investigated. Secondary ion mass spectrometry results show that Ti can be added to diamond films through the MPCVD system using tetra n-butyl titanate as precursor. The spectra from X-ray diffraction, Raman spectroscopy, and X-ray photoelectron spectroscopy and the images from scanning electron microscopy of the deposited films indicate that the diamond phase clearly exists and dominates in Ti-doped diamond films. The amount of Ti added obviously influences film morphology and the preferred orientation of the crystals. Ti doping is beneficial to the second nucleation and the growth of the (1 1 0) faceted grains.

  10. Structural Transformation upon Nitrogen Doping of Ultrananocrystalline Diamond Films by Microwave Plasma CVD

    Directory of Open Access Journals (Sweden)

    Chien-Chung Teng

    2009-01-01

    Full Text Available The molecular properties and surface morphology of undoped and N-doped ultra-nanocrystalline diamond (UNCD films deposited by microwave plasma CVD with addition of nitrogen are investigated with various spectroscopic techniques. The results of spatially resolved Raman scattering, ATR/FT-IR and XPS spectra show more amorphous and sp2/sp3 ratio characteristics in N-doped UNCD films. The surface morphology in AFM scans shows larger nanocrystalline diamond clusters in N-doped UNCD films. Incorporation of nitrogen into UNCD films has promoted an increase of amorphous sp2-bonded carbons in the grain boundaries and the size of nanocrystalline diamond grains that are well correlated to the reported enhancement of conductivity and structural changes of UNCD films.

  11. Fuel gas and char from pyrolysis of waste paper in a microwave plasma reactor

    Energy Technology Data Exchange (ETDEWEB)

    Khongkrapan, Parin; Thanompongchart, Patipat; Tippayawong, Nakorn; Kiatsiriroat, Tanongkiat [Department of Mechanical Engineering, Faculty of Engineering, Chiang Mai University, Chiang Mai 50200 (Thailand)

    2013-07-01

    In this study, a microwave plasma reactor was used for pyrolysis of waste papers. The effects of different argon flow rates on char and gas generation were investigated. Changes in carbon and oxygen contents from those in paper to char were significant. Char yield of over 25 % was obtained with the heating value of about 38 MJ/kg. Average gas yield and total content of combustible fraction (CO, CH4 and H2) in the gas product were 2.56 m3/kg and 36 %, respectively. The heating value of gas product and carbon conversion efficiency of the process were maximum at 6.0 MJ/m3 and 73 %, respectively.

  12. Preparation of carbon nanotubes with different morphology by microwave plasma enhanced chemical vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Duraia, El-Shazly M. [Suez Canal University, Faculty of Science, Physics Department, Ismailia (Egypt); Al-Farabi Kazakh National University, 71 Al-Farabi av., 050038 Almaty (Kazakhstan); Institute of Physics and Technology, Ibragimov Street 11, 050032 Almaty (Kazakhstan); Mansurov, Zulkhair [Al-Farabi Kazakh National University, 71 Al-Farabi av., 050038 Almaty (Kazakhstan); Tokmoldin, S.Zh. [Institute of Physics and Technology, Ibragimov Street 11, 050032 Almaty (Kazakhstan)

    2010-04-15

    In this work we present a part of our results about the preparation of carbon nanotube with different morphologies by using microwave plasma enhanced chemical vapour deposition MPECVD. Well aligned, curly, carbon nanosheets, coiled carbon sheets and carbon microcoils have been prepared. We have investigated the effect of the different growth condition parameters such as the growth temperature, pressure and the hydrogen to methane flow rate ratio on the morphology of the carbon nanotubes. The results showed that there is a great dependence of the morphology of carbon nanotubes on these parameters. The yield of the carbon microcoils was high when the growth temperature was 700 C. There is a linear relation between the growth rate and the methane to hydrogen ratio. The effect of the gas pressure on the CNTs was also studied. Our samples were investigated by scanning electron microscope and Raman spectroscopy (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  13. Branched carbon nanofiber network synthesis at room temperature using radio frequency supported microwave plasmas

    International Nuclear Information System (INIS)

    Boskovic, Bojan O.; Stolojan, Vlad; Zeze, Dagou A.; Forrest, Roy D.; Silva, S. Ravi P.; Haq, Sajad

    2004-01-01

    Carbon nanofibers have been grown at room temperature using a combination of radio frequency and microwave assisted plasma-enhanced chemical vapor deposition. The nanofibers were grown, using Ni powder catalyst, onto substrates kept at room temperature by using a purposely designed water-cooled sample holder. Branched carbon nanofiber growth was obtained without using a template resulting in interconnected carbon nanofiber network formation on substrates held at room temperature. This method would allow room-temperature direct synthesized nanofiber networks over relatively large areas, for a range of temperature sensitive substrates, such as organic materials, plastics, and other polymers of interest for nanoelectronic two-dimensional networks, nanoelectromechanical devices, nanoactuators, and composite materials

  14. Decomposition of methane hydrate for hydrogen production using microwave and radio frequency in-liquid plasma methods

    International Nuclear Information System (INIS)

    Rahim, Ismail; Nomura, Shinfuku; Mukasa, Shinobu; Toyota, Hiromichi

    2015-01-01

    This research involves two in-liquid plasma methods of methane hydrate decomposition, one using radio frequency wave (RF) irradiation and the other microwave radiation (MW). The ultimate goal of this research is to develop a practical process for decomposition of methane hydrate directly at the subsea site for fuel gas production. The mechanism for methane hydrate decomposition begins with the dissociation process of methane hydrate formed by CH_4 and water. The process continues with the simultaneously occurring steam methane reforming process and methane cracking reaction, during which the methane hydrate is decomposed releasing CH_4 into H_2, CO and other by-products. It was found that methane hydrate can be decomposed with a faster rate of CH_4 release using microwave irradiation over that using radio frequency irradiation. However, the radio frequency plasma method produces hydrogen with a purity of 63.1% and a CH conversion ratio of 99.1%, which is higher than using microwave plasma method which produces hydrogen with a purity of 42.1% and CH_4 conversion ratio of 85.5%. - Highlights: • The decomposition of methane hydrate is proposed using plasma in-liquid method. • Synthetic methane hydrate is used as the sample for decomposition in plasma. • Hydrogen can be produced from decomposition of methane hydrate. • Hydrogen purity is higher when using radio frequency stimulation.

  15. Measurements of energy distribution and thrust for microwave plasma coupling of electrical energy to hydrogen for propulsion

    Science.gov (United States)

    Morin, T.; Chapman, R.; Filpus, J.; Hawley, M.; Kerber, R.; Asmussen, J.; Nakanishi, S.

    1982-01-01

    A microwave plasma system for transfer of electrical energy to hydrogen flowing through the system has potential application for coupling energy to a flowing gas in the electrothermal propulsion concept. Experimental systems have been designed and built for determination of the energy inputs and outputs and thrust for the microwave coupling of energy to hydrogen. Results for experiments with pressure in the range 100 microns-6 torr, hydrogen flow rate up to 1000 micronmoles/s, and total absorbed power to 700 w are presented.

  16. [Experimental study on the corrosion behavior of a type of oral near β-type titanium alloys modified with double glow plasma nitriding].

    Science.gov (United States)

    Wen, Ke; Li, Fenglan

    2015-12-01

    To study the electrochemical corrosion performance of a type of biomedical materials near beta titanium alloy(Ti-3Zr-2Sn-3Mo-25Nb, TLM) in artificial saliva before and after nitride changing, and to provide clinical basis for clinical application of titanium alloy TLM. The double glow plasma alloying technology was used to nitride the surface of titanium alloy TLM. The surface properties of the modified layer were observed and tested by optical microscope, scanning electron microscope, glow discharge spectrum analyzer, X-ray diffraction and micro hardness tester. Then, electrochemical measurement system was used to test and compare titanium alloy TLM's electrochemical corrosion in artificial saliva before and after its surface change. Finally, the surface morphology of the original titanium alloy and the modified layer was compared by scanning electron microscope. By the technology of double glow plasma nitriding, the surface of the titanium alloy TLM had been successfully nitrided with a modified layer of 4-5 µm in thickness, uniform and compact. Its main compositions were Ti and Ti(2)N. The Microhardness of modified layer also had been improved from (236.8 ± 5.4) to (871.8 ± 5.2) HV. The self-corrosion potential in electrochemical corrosion tests had been increased from -0.559 V to -0.540 V, while the self- corrosion current density had been reduced from 2.091 × 10(-7) A/cm(2) to 7.188 × 10(-8) A/cm(2). Besides, alternating-current impedance(AC Impedance) had also been increased. With the scanning electron microscope, it's obvious that the diameter of corrosion holes on modified layer were approximately 10 µm. As to the diameter and number of corrosion holes on modified layer, they had been decreased comparing with the original titanium alloy. The type of near beta titanium alloy TLM can construct a nitriding modified layer on its surface. Meanwhile, the performance of its anti- corrosion in artificial saliva has been improved, comparing to the original

  17. Detailed spectra of high power broadband microwave radiation from interactions of relativistic electron beams with weakly magnetized plasmas

    International Nuclear Information System (INIS)

    Kato, K.G.; Benford, G.; Tzach, D.

    1983-01-01

    Prodigious quantities of microwave energy are observed uniformly across a wide frequency band when a relativistic electron beam (REB) penetrates a plasma. Measurement calculations are illustrated. A model of Compton-like boosting of ambient plasma waves by beam electrons, with collateral emission of high frequency photons, qualitatively explain the spectra. A transition in spectral behavior is observed from the weak to strong turbulence theories advocated for Type III solar burst radiation, and further into the regime the authors characterize as super-strong REB-plasma interactions

  18. Production of atmospheric pressure microwave plasma with dielectric half-mirror resonator and its application to polymer surface treatment

    Science.gov (United States)

    Sasai, Kensuke; Keyamura, Kazuki; Suzuki, Haruka; Toyoda, Hirotaka

    2018-06-01

    For the surface treatment of a polymer tube, a ring-shaped atmospheric pressure microwave plasma (APMP) using a coaxial waveguide is studied. In this APMP, a dielectric plate is used not only as a partial mirror for cavity resonation but also for the precise alignment of the discharge gap for ring-shaped plasma production. The optimum position of the dielectric plate is investigated by electromagnetic wave simulation. On the basis of simulation results, a ring-shaped plasma with good uniformity along the ring is produced. The coaxial APMP is applied to the surface treatment of ethylene tetrafluoroethylene. A very fast surface modification within 3 s is observed.

  19. Mineral distribution in rice: Measurement by Microwave Plasma Atomic Emission Spectroscopy (MP-AES)

    International Nuclear Information System (INIS)

    Ramos, Nerissa C.; Ramos, R.G.A.; Quirit, L.L.; Arcilla, C.A.

    2015-01-01

    Microwave Plasma Atomic Emission Spectroscopy (MP-AES) is a new technology with comparable performance and sensitivity to Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). Both instrument use plasma as the energy source that produces atomic and ionic emission lines. However, MP-AES uses nitrogen as the plasma gas instead of argon which is an additional expense for ICP-OES. Thus, MP-AES is more economical. This study quantified six essential minerals (Se, Zn, Fe, Cu, Mn and K) in rice using MP-AES. Hot plate digestion was used for sample extraction and the detection limit for each instrument was compared with respect to the requirement for routine analysis in rice. Black, red and non-pigmented rice samples were polished in various intervals to determine the concentration loss of minerals. The polishing time corresponds to the structure of the rice grains such as outer bran layer (0 to 15), inner bran layer (15 to 30), outer endosperm layer (30 to 45), and middle endosperm layer (45 to 60). Results of MP-AES analysis showed that black rice had all essential materials (except K) in high concentration at the outer bran layer. The red and non-pigmented rice samples on the other hand, contained high levels of Se, Zn, Fe, and Mn in the whole bran portion. After 25 seconds, the mineral concentrations remained constant. The concentration of Cu however, gave consistent value in all polishing intervals, hence Cu might be located in the inner endosperm layer. Results also showed that K was uniformly distributed in all samples where 5% loss was consistently observed for every polishing interval. Therefore, the concentration of K was also affected by polishing time. Thus, the new MP-AES technology with comparable performance to ICP-OES is a promising tool for routine analysis in rice. (author)

  20. Permeation mechanisms of pulsed microwave plasma deposited silicon oxide films for food packaging applications

    International Nuclear Information System (INIS)

    Deilmann, Michael; Grabowski, Mirko; Theiss, Sebastian; Bibinov, Nikita; Awakowicz, Peter

    2008-01-01

    Silicon oxide barrier layers are deposited on polyethylene terephthalate as permeation barriers for food packaging applications by means of a low pressure microwave plasma. Hexamethyldisiloxane (HMDSO) and oxygen are used as process gases to deposit SiO x coatings via pulsed low pressure plasmas. The layer composition of the coating is investigated by Fourier transform infrared spectroscopy and energy dispersive x-ray spectroscopy to show correlations with barrier properties of the films. The oxygen permeation barrier is determined by the carrier gas method using an electrochemical detector. The transition from low to high barrier films is mapped by the transition from organic SiO x C y H z layers to quartz-like SiO 1.7 films containing silanol bound hydrogen. A residual permeation as low as J = 1 ± 0.3 cm 3 m -2 day -1 bar -1 is achieved, which is a good value for food packaging applications. Additionally, the activation energy E p of oxygen permeation is analysed and a strong increase from E p = 31.5 kJ mol -1 for SiO x C y H z -like coatings to E p = 53.7 kJ mol -1 for SiO 1.7 films is observed by increasing the oxygen dilution of HMDSO:O 2 plasma. The reason for the residual permeation of high barrier films is discussed and coating defects are visualized by capacitively coupled atomic oxygen plasma etching of coated substrates. A defect density of 3000 mm -2 is revealed

  1. Modeling Plasma Formation in a Micro-gap at Microwave Frequency

    Science.gov (United States)

    Bowman, Arthur; Remillard, Stephen

    2013-03-01

    In the presence of a strong electric field, gas molecules become ionized, forming a plasma. The study of this dielectric breakdown at microwave frequency has important applications in improving the operation of radio frequency (RF) devices, where the high electric fields present in small gaps can easily ionize gases like air. A cone and tuner resonant structure was used to induce breakdown of diatomic Nitrogen in adjustable micro-gaps ranging from 13 to 1,156 μm. The electric field for plasma formation exhibited strong pressure dependence in the larger gap sizes, as predicted by previous theoretical and experimental work. Pressure is proportional to the frequency of collision between electrons and molecules, which increases with pressure when the gap is large, but levels off in the micro-gap region. A separate model of the breakdown electric field based on the characteristic diffusion length of the plasma also fit the data poorly for these smaller gap sizes. This may be explained by a hypothesis that dielectric breakdown at and below the 100 μm gap size occurs outside the gap, an argument that is supported by the observation of very high breakdown threshold electric fields in this region. Optical emissions revealed that vibrational and rotational molecular transitions of the first positive electronic system are suppressed in micro-gaps, indicating that transitions into the molecular ground state do not occur in micro-gap plasmas. Acknowledgements: National Science Foundation under NSF-REU Grant No. PHY/DMR-1004811, the Provost's Office of Hope College, and the Hope College Division of Natural and Applied Sciences.

  2. Silicon nitride films fabricated by a plasma-enhanced chemical vapor deposition method for coatings of the laser interferometer gravitational wave detector

    Science.gov (United States)

    Pan, Huang-Wei; Kuo, Ling-Chi; Huang, Shu-Yu; Wu, Meng-Yun; Juang, Yu-Hang; Lee, Chia-Wei; Chen, Hsin-Chieh; Wen, Ting Ting; Chao, Shiuh

    2018-01-01

    Silicon is a potential substrate material for the large-areal-size mirrors of the next-generation laser interferometer gravitational wave detector operated in cryogenics. Silicon nitride thin films uniformly deposited by a chemical vapor deposition method on large-size silicon wafers is a common practice in the silicon integrated circuit industry. We used plasma-enhanced chemical vapor deposition to deposit silicon nitride films on silicon and studied the physical properties of the films that are pertinent to application of mirror coatings for laser interferometer gravitational wave detectors. We measured and analyzed the structure, optical properties, stress, Young's modulus, and mechanical loss of the films, at both room and cryogenic temperatures. Optical extinction coefficients of the films were in the 10-5 range at 1550-nm wavelength. Room-temperature mechanical loss of the films varied in the range from low 10-4 to low 10-5 within the frequency range of interest. The existence of a cryogenic mechanical loss peak depended on the composition of the films. We measured the bond concentrations of N - H , Si - H , Si - N , and Si - Si bonds in the films and analyzed the correlations between bond concentrations and cryogenic mechanical losses. We proposed three possible two-level systems associated with the N - H , Si - H , and Si - N bonds in the film. We inferred that the dominant source of the cryogenic mechanical loss for the silicon nitride films is the two-level system of exchanging position between a H+ and electron lone pair associated with the N - H bond. Under our deposition conditions, superior properties in terms of high refractive index with a large adjustable range, low optical absorption, and low mechanical loss were achieved for films with lower nitrogen content and lower N - H bond concentration. Possible pairing of the silicon nitride films with other materials in the quarter-wave stack is discussed.

  3. Effects of N{sub 2} and NH{sub 3} remote plasma nitridation on the structural and electrical characteristics of the HfO{sub 2} gate dielectrics

    Energy Technology Data Exchange (ETDEWEB)

    Park, K.-S., E-mail: kunsik@etri.re.kr [RFID/USN Research Department, Electronics and Telecommunications Research Institute, Daejeon 305-700 (Korea, Republic of); Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701 (Korea, Republic of); Baek, K.-H.; Kim, D.P.; Woo, J.-C.; Do, L.-M. [RFID/USN Research Department, Electronics and Telecommunications Research Institute, Daejeon 305-700 (Korea, Republic of); No, K.-S. [Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701 (Korea, Republic of)

    2010-12-01

    The remote plasma nitridation (RPN) of an HfO{sub 2} film using N{sub 2} and NH{sub 3} has been investigated comparatively. X-ray photoelectron spectroscopy and Auger electron spectroscopy analyses after post-deposition annealing (PDA) at 700 deg. C show that a large amount of nitrogen is present in the bulk film as well as in the interfacial layer for the HfO{sub 2} film nitrided with NH{sub 3}-RPN. It is also shown that the interfacial layer formed during RPN and PDA is a nitrogen-rich Hf-silicate. The C-V characteristics of an HfO{sub x}N{sub y} gate dielectric nitrided with NH{sub 3}-RPN have a smaller equivalent oxide thickness than that nitrided with N{sub 2}-RPN in spite of its thicker interfacial layer.

  4. 2D Doppler backscattering using synthetic aperture microwave imaging of MAST edge plasmas

    Science.gov (United States)

    Thomas, D. A.; Brunner, K. J.; Freethy, S. J.; Huang, B. K.; Shevchenko, V. F.; Vann, R. G. L.

    2016-02-01

    Doppler backscattering (DBS) is already established as a powerful diagnostic; its extension to 2D enables imaging of turbulence characteristics from an extended region of the cut-off surface. The Synthetic Aperture Microwave Imaging (SAMI) diagnostic has conducted proof-of-principle 2D DBS experiments of MAST edge plasma. SAMI actively probes the plasma edge using a wide (±40° vertical and horizontal) and tuneable (10-34.5 GHz) beam. The Doppler backscattered signal is digitised in vector form using an array of eight Vivaldi PCB antennas. This allows the receiving array to be focused in any direction within the field of view simultaneously to an angular range of 6-24° FWHM at 10-34.5 GHz. This capability is unique to SAMI and is a novel way of conducting DBS experiments. In this paper the feasibility of conducting 2D DBS experiments is explored. Initial observations of phenomena previously measured by conventional DBS experiments are presented; such as momentum injection from neutral beams and an abrupt change in power and turbulence velocity coinciding with the onset of H-mode. In addition, being able to carry out 2D DBS imaging allows a measurement of magnetic pitch angle to be made; preliminary results are presented. Capabilities gained through steering a beam using a phased array and the limitations of this technique are discussed.

  5. Plasma nitriding induced growth of Pt-nanowire arrays as high performance electrocatalysts for fuel cells

    Science.gov (United States)

    Du, Shangfeng; Lin, Kaijie; Malladi, Sairam K.; Lu, Yaxiang; Sun, Shuhui; Xu, Qiang; Steinberger-Wilckens, Robert; Dong, Hanshan

    2014-09-01

    In this work, we demonstrate an innovative approach, combing a novel active screen plasma (ASP) technique with green chemical synthesis, for a direct fabrication of uniform Pt nanowire arrays on large-area supports. The ASP treatment enables in-situ N-doping and surface modification to the support surface, significantly promoting the uniform growth of tiny Pt nuclei which directs the growth of ultrathin single-crystal Pt nanowire (2.5-3 nm in diameter) arrays, forming a three-dimensional (3D) nano-architecture. Pt nanowire arrays in-situ grown on the large-area gas diffusion layer (GDL) (5 cm2) can be directly used as the catalyst electrode in fuel cells. The unique design brings in an extremely thin electrocatalyst layer, facilitating the charge transfer and mass transfer properties, leading to over two times higher power density than the conventional Pt nanoparticle catalyst electrode in real fuel cell environment. Due to the similar challenges faced with other nanostructures and the high availability of ASP for other material surfaces, this work will provide valuable insights and guidance towards the development of other new nano-architectures for various practical applications.

  6. Realization of high efficiency in a plasma-assisted microwave source with two-dimensional electron motion

    International Nuclear Information System (INIS)

    Shkvarunets, A.G.; Carmel, Y.; Nusinovich, G.S.; Abu-elfadl, T.M.; Rodgers, J.; Antonsen, T.M. Jr.; Granatstein, V.; Goebel, D.M.

    2002-01-01

    Conventional microwave sources utilize a strong axial magnetic field to guide an electron beam through an interaction region. A plasma-assisted slow wave microwave oscillator (Pasotron) can operate without an external magnetic field because the presence of ions neutralizes the space charge in the beam, permits the self-pinch forces to provide beam propagation, and allows for the radial motion of electrons under the action of transverse fields of the wave. While the inherent efficiency of conventional microwave sources with 1D electron flow is limited to 15%-20%, it is shown in this work that both the calculated and measured inherent efficiency of devices with 2D electron flow can be higher than 50%. Both in situ diagnostics and analysis confirmed that the enhanced efficiency is due to the fact that rf forces dominate the beam dynamics

  7. High power microwave transmission systems for electron cyclotron resonance plasma heating

    International Nuclear Information System (INIS)

    Vernon, R.J.

    1989-08-01

    This progress report is for the fourth year of a grant from the US Department of Energy for the design, development, and fabrication of ECRF transmission and mode conversion systems to transport microwave power from a gyrotron to a magnetically confined plasma. The development and testing of new and improved components for such systems and underlying theory, where necessary, is the focus of this project. Devising and improving component testing and diagnostic techniques is also an important part of this effort. During the last year, we developed a preliminary design for a Te 15,2 --TE 15, 1 mode converter for the MIT 150 GHz gyrotron and considered its performance as the frequency and mode was step tuned. A preliminary design for a combined uptaper and TE 15,2 --TE 15,1 converter for possible use with the Varian 140 GHz gyrotron was also developed. Work was begun on a combined TE 15,n uptaper -- mode converter to produce a mode combination which would reduce microwave radiation into an azimuthal waveguide gap. Simple models for the radiation from TE 0n and TM 0n Vlasov launcher baffles were developed and compared with measurements which were taken in our radiation pattern measurement facility. Work began on testing possible methods for generating high azimuthal index rotating modes. Work on the further refinement of the method of mode content determination from open-end radiation pattern measurement was carried out. An investigation of the Wiener-Hopf method for obtaining open- end radiation patterns produced improved radiation patterns for the TE 0n modes in a circular waveguide. 15 refs., 15 figs

  8. Modelling of an intermediate pressure microwave oxygen discharge reactor: from stationary two-dimensional to time-dependent global (volume-averaged) plasma models

    International Nuclear Information System (INIS)

    Kemaneci, Efe; Graef, Wouter; Rahimi, Sara; Van Dijk, Jan; Kroesen, Gerrit; Carbone, Emile; Jimenez-Diaz, Manuel

    2015-01-01

    A microwave-induced oxygen plasma is simulated using both stationary and time-resolved modelling strategies. The stationary model is spatially resolved and it is self-consistently coupled to the microwaves (Jimenez-Diaz et al 2012 J. Phys. D: Appl. Phys. 45 335204), whereas the time-resolved description is based on a global (volume-averaged) model (Kemaneci et al 2014 Plasma Sources Sci. Technol. 23 045002). We observe agreement of the global model data with several published measurements of microwave-induced oxygen plasmas in both continuous and modulated power inputs. Properties of the microwave plasma reactor are investigated and corresponding simulation data based on two distinct models shows agreement on the common parameters. The role of the square wave modulated power input is also investigated within the time-resolved description. (paper)

  9. Characterization and modelling of microwave multi dipole plasmas. Application to multi dipolar plasma assisted sputtering; Caracterization et modelisation des plasmas micro-onde multi-dipolaires. Application a la pulverisation assistee par plasma multi-dipolaire

    Energy Technology Data Exchange (ETDEWEB)

    Tran, Tan Vinh [Universite Joseph Fourier/CNRS-IN2P3, 53 Avenue des Martyrs, F-38026 Grenoble (France)

    2006-07-01

    The scaling up of plasma processes in the low pressure range remains a question to be solved for their rise at the industrial level. One solution is the uniform distribution of elementary plasma sources where the plasma is produced via electron cyclotron resonance (ECR) coupling. These elementary plasma sources are made up of a cylindrical permanent magnet (magnetic dipole) set at the end of a coaxial microwave line. Although of simple concept, the optimisation of these dipolar plasma sources is in fact a complex problem. It requires the knowledge, on one hand, of the configurations of static magnetic fields and microwave electric fields, and, on the other hand, of the mechanisms of plasma production in the region of high intensity magnetic field (ECR condition), and of plasma diffusion. Therefore, the experimental characterisation of the operating ranges and plasma parameters has been performed by Langmuir probes and optical emission spectroscopy on different configurations of dipolar sources. At the same time, in a first analytical approach, calculations have been made on simple magnetic field configurations, motion and trajectory of electrons in these magnetic fields, and the acceleration of electrons by ECR coupling. Then, the results have been used for the validation of the numerical modelling of the electron trajectories by using a hybrid PIC (particle-in-cell) / MC (Monte Carlo) method. The experimental study has evidenced large operating domains, between 15 and 200 W of microwave power, and from 0.5 to 15 mTorr argon pressure. The analysis of plasma parameters has shown that the region of ECR coupling is localised near the equatorial plane of the magnet and dependent on magnet geometry. These characterizations, applied to a cylindrical reactor using 48 sources, have shown that densities between 10{sup 11} and 10{sup 12} cm{sup -3} could be achieved in the central part of the volume at a few mTorr argon pressures. The modelling of electron trajectories near

  10. Effect of additive gases and injection methods on chemical dry etching of silicon nitride, silicon oxynitride, and silicon oxide layers in F2 remote plasmas

    International Nuclear Information System (INIS)

    Yun, Y. B.; Park, S. M.; Kim, D. J.; Lee, N.-E.; Kim, K. S.; Bae, G. H.

    2007-01-01

    The authors investigated the effects of various additive gases and different injection methods on the chemical dry etching of silicon nitride, silicon oxynitride, and silicon oxide layers in F 2 remote plasmas. N 2 and N 2 +O 2 gases in the F 2 /Ar/N 2 and F 2 /Ar/N 2 /O 2 remote plasmas effectively increased the etch rate of the layers. The addition of direct-injected NO gas increased the etch rates most significantly. NO radicals generated by the addition of N 2 and N 2 +O 2 or direct-injected NO molecules contributed to the effective removal of nitrogen and oxygen in the silicon nitride and oxide layers, by forming N 2 O and NO 2 by-products, respectively, and thereby enhancing SiF 4 formation. As a result of the effective removal of the oxygen, nitrogen, and silicon atoms in the layers, the chemical dry etch rates were enhanced significantly. The process regime for the etch rate enhancement of the layers was extended at elevated temperature

  11. Growth of thin SiC films on Si single crystal wafers with a microwave excited plasma of methane gas

    DEFF Research Database (Denmark)

    Dhiman, Rajnish; Morgen, Per

    2013-01-01

    Wehave studied the growth and properties of SiC films on Siwafers, under ultrahigh vacuumbackground con- ditions, using a remote-, microwave excited,methane plasma as a source of active carbon and hydrogen,while the Si substrates were held at a temperature of near 700 °C. The reaction is diffusio......Wehave studied the growth and properties of SiC films on Siwafers, under ultrahigh vacuumbackground con- ditions, using a remote-, microwave excited,methane plasma as a source of active carbon and hydrogen,while the Si substrates were held at a temperature of near 700 °C. The reaction...... lowdensity of these, and are otherwise very uniform and poly- crystalline. They are characterized with scanning electron microscopy, atomic force microscopy, X-ray photo- electron spectroscopy, X-ray diffraction, and hardnessmeasurements....

  12. [Determination of 24 minerals in human milk by inductively coupled plasma mass spectrometry with microwave digestion].

    Science.gov (United States)

    Sun, Zhongqing; Yue, Bing; Yang, Zhenyu; Li, Xiaowei; Wu, Yongning; Yin, Shian

    2013-05-01

    To determine the levels of 24 minerals in human milk by inductively coupled plasma mass spectrometry with microwave digestion. The samples were digested by microwave. The contents of minerals were determined by inductively coupled plasma mass spectrometry. The standard reference minerals of 1849a and 1568a from National Institute of Science and Technology were used for quality control. The accuracy and reproduability for this method were evaluated with mix standards and 1849a and 1568a standard reference materials. The ranges of the levels of sodium, magnesium, phosphorus, potassium, calcium, aluminum, chromium, arsenic, selenium, iron, zinc, manganese, copper, molybdenum, vanadium, cobalt, nickel, gallium, cadmium, silver, strontium, cesium, barium, lead in human milk was 34.97-415.83 mg/kg, 19.00-39.52 mg/kg, 102.13-274.53 mg/kg, 351.19-713.99 mg/kg, 180.08-349.64 mg/kg, 0.06-0.44 mg/kg, 0.9-7.37 microg/kg, 0.92-2.72 microg/kg, 0.20-21.15 microg/kg, 0.10-0.70 mg/kg, 0.56-3.25 mg/kg, 3.00-16.12 micro.g/kg, 62.16-591.69 microg/kg, 0.02-6.91 microg/kg, 5.99-13.70 microg/kg, 0.07-2.11 microg/kg, 0.77-209.26 microg/kg, 0.005-0.28 microg/kg, 0.02-0.23 microg/kg, 0.02-0.71 microg/kg, 36.89-132.26 microg/kg, 0.01-4.72 microg/kg, 0.83-28.16 microg/kg, 2.5-5.3 microg/kg, respectively. The levels of minerals in human milk in present study were consisted with other similar studies. The experiment examined the levels of minerals in human milk satisfactorily. The method has high accuracy and good reproducibility, which could be used for understanding the levels of minerals in human milk.

  13. Properties of hydrogenated amorphous silicon (a-Si:H) deposited using a microwave Ecr plasma; Propiedades del a-Si:H depositado utilizando un plasma de microondas

    Energy Technology Data Exchange (ETDEWEB)

    Mejia H, J A

    1997-12-31

    Hydrogenated amorphous silicon (a-Si:H) films have been widely applied to semiconductor devices, such as thin film transistors, solar cells and photosensitive devices. In this work, the first Si-H-Cl alloys (obtained at the National Institute for Nuclear Research of Mexico) were formed by a microwave electron cyclotron resonance (Ecr) plasma CVD method. Gaseous mixtures of silicon tetrachloride (Si Cl{sub 4}), hydrogen and argon were used. The Ecr plasma was generated by microwaves at 2.45 GHz and a magnetic field of 670 G was applied to maintain the discharge after resonance condition (occurring at 875 G). Si and Cl contents were analyzed by Rutherford Backscattering Spectrometry (RBS). It was found that, increasing proportion of Si Cl{sub 4} in the mixture or decreasing pressure, the silicon and chlorine percentages decrease. Optical gaps were obtained by spectrophotometry. Decreasing temperature, optical gap values increase from 1.4 to 1.5 eV. (Author).

  14. Characterization of surface hardening in a nitrated chromium steel by microwave plasma type ECR (Electron Cyclotron Resonance); Caracterizacion del endurecimiento superficial del acero H-12 nitrurado con plasma de microondas tipo ECR

    Energy Technology Data Exchange (ETDEWEB)

    La O C, G de

    1996-12-31

    With this work it is demonstrated the possibility of performing the nitriding process by using a CVD-ECR source, based on the results obtained after treating several samples of AISI H-12 steel. Also, the main operating parameters (time of treatment, sample temperatures and gas mixture) are determined during nitriding of this steel with the mentioned source. Samples used before nitriding were quenched and tempered at 580 Centigrade degrees. Several experiments were done by using a pure nitrogen plasma with exposure times of the samples of 20 minutes at temperatures from 450 to 550 Centigrade degrees, and by using a N{sub 2} - H{sub 2} plasma with exposure times of the samples of 20, 30 and 40 minutes at temperatures from 350 to 550 Centigrade degrees. Metallography, microhardness, EDS and Auger analysis were done to observe changes suffered for the samples after treatment. (Author).

  15. Expansion tunnel characterization and development of non-intrusive microwave plasma diagnostics

    Science.gov (United States)

    Dufrene, Aaron T.

    The focus of this research is the development of non-intrusive microwave diagnostics for characterization of expansion tunnels. The main objectives of this research are to accurately characterize the LENS XX expansion tunnel facility, develop non-intrusive RF diagnostics that will work in short-duration expansion tunnel testing, and to determine plasma properties and other information that might otherwise be unknown, less accurate, intrusive, or more difficult to determine through conventional methods. Testing was completed in LENS XX, a new large-scale expansion tunnel facility at CUBRC, Inc. This facility is the largest known expansion tunnel in the world with an inner diameter of 24 inches, a 96 inch test section, and an end-to-end length of more than 240 ft. Expansion tunnels are currently the only facilities capable of generating high-enthalpy test conditions with minimal or no freestream dissociation or ionization. However, short test times and freestream noise at some conditions have limited development of these facilities. To characterize the LENS XX facility, the first step is to evaluate the facility pressure, vacuum, temperature, and other mechanical restrictions to derive a theoretical testing parameter space. Test condition maps are presented for a variety of parameters and gases based on 1D perfect gas dynamics. Test conditions well beyond 10 km/s or 50 MJ/kg are identified with minimum test times of 200 us. Additionally, a four-chamber expansion tube configuration is considered for extending the stagnation enthalpy range of the facility even further. A microwave shock speed diagnostic measures primary and secondary shock speeds accurately every 30 in. down the entire length of the facility resulting in a more accurate determination of freestream conditions required for computational comparisons. The high resolution of this measurement is used to assess shock speed attenuation as well as secondary diaphragm performance. Negligible shock attenuation is

  16. Hydrogen plasma enhanced alignment on CNT-STM tips grown by liquid catalyst-assisted microwave plasma-enhanced chemical vapor deposition

    International Nuclear Information System (INIS)

    Tung, Fa-Kuei; Yoshimura, Masamichi; Ueda, Kazuyuki; Ohira, Yutaka; Tanji, Takayoshi

    2008-01-01

    Carbon nanotubes are grown directly on a scanning tunneling microscopy tip by liquid catalyst-assisted microwave-enhanced chemical vapor deposition, and effects of hydrogen plasma treatment on the tip have been investigated in detail by field-emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM) and Raman spectroscopy. The unaligned CNTs on the as-grown tip apex have been realigned and reshaped by subsequent hydrogen plasma treatment. The diameter of CNTs is enlarged mainly due to amorphous layers being re-sputtered over their outer shells

  17. Surface functionalization of microwave plasma-synthesized silica nanoparticles for enhancing the stability of dispersions

    Science.gov (United States)

    Sehlleier, Yee Hwa; Abdali, Ali; Schnurre, Sophie Marie; Wiggers, Hartmut; Schulz, Christof

    2014-08-01

    Gas phase-synthesized silica nanoparticles were functionalized with three different silane coupling agents (SCAs) including amine, amine/phosphonate and octyltriethoxy functional groups and the stability of dispersions in polar and non-polar dispersing media such as water, ethanol, methanol, chloroform, benzene, and toluene was studied. Fourier transform infrared spectroscopy showed that all three SCAs are chemically attached to the surface of silica nanoparticles. Amine-functionalized particles using steric dispersion stabilization alone showed limited stability. Thus, an additional SCA with sufficiently long hydrocarbon chains and strong positively charged phosphonate groups was introduced in order to achieve electrosteric stabilization. Steric stabilization was successful with hydrophobic octyltriethoxy-functionalized silica nanoparticles in non-polar solvents. The results from dynamic light scattering measurements showed that in dispersions of amine/phosphonate- and octyltriethoxy-functionalized silica particles are dispersed on a primary particle level. Stable dispersions were successfully prepared from initially agglomerated nanoparticles synthesized in a microwave plasma reactor by designing the surface functionalization.

  18. Investigation of graft copolymerization modification of PTFE surface using microwave plasma

    International Nuclear Information System (INIS)

    Wen Yunjian; Guan Weishu; Fang Yan; Ying Yongxiang

    1995-03-01

    Investigation of graft copolymerization modification of PTFE surface with kind of one or another reactive monomers was performed by using non-equilibrium microwave plasma at 2.45 GHz under various operating conditions. Untreated clean samples and grafted samples were examined and analyzed with different surface analytical techniques such as X-Ray Photoelectron Spectroscopy (XPS), Attenuated Total Reflectance-Fourier Transform Infrared Spectroscopy (ATR-FTIR) and Scanning Electron Microscopy (SEM). The results showed that the occurrence of noticeable de-fluorination and cross linking on grafted surface, and different polar groups and content of oxygen-containing were introduced into the grafted surface of PTFE. Fibriform hetero-structure layer was also formed. These results confirmed the success of graft and indicated that the hydrophilicity of the grafted surface is excellent and a significant improvement in adhesion characteristics has been achieved. The experiments revealed that the changes in surface properties are correlated closely to the changes in chemical structure, composition and morphology. (8 figs., 1 refs.)

  19. A Novel Microwave-Induced Plasma Ionization Source for Ion Mobility Spectrometry

    Science.gov (United States)

    Dai, Jianxiong; Zhao, Zhongjun; Liang, Gaoling; Duan, Yixiang

    2017-03-01

    This work demonstrates the application of a novel microwave induced plasma ionization (MIPI) source to ion mobility spectrometry (IMS). The MIPI source, called Surfatron, is composed of a copper cavity and a hollow quartz discharge tube. The ion mobility spectrum of synthetics air has a main peak with reduced mobility of 2.14 cm2V-1s-1 for positive ion mode and 2.29 cm2V-1s-1 for negative ion mode. The relative standard deviations (RSD) are 0.7% and 1.2% for positive and negative ion mode, respectively. The total ion current measured was more than 3.5 nA, which is much higher than that of the conventional 63Ni source. This indicates that a better signal-to-noise ratio (SNR) can be acquired from the MIPI source. The SNR was 110 in the analysis of 500 pptv methyl tert-butyl ether (MTBE), resulting in the limit of detection (SNR = 3) of 14 pptv. The linear range covers close to 2.5 orders of magnitude in the detection of triethylamine with a concentration range from 500 pptv to 80 ppbv. Finally, this new MIPI-IMS was used to detect some volatile organic compounds, which demonstrated that the MIPI-IMS has great potential in monitoring pollutants in air.

  20. Removal and sterilization of biofilms and planktonic bacteria by microwave-induced argon plasma at atmospheric pressure

    International Nuclear Information System (INIS)

    Lee, Mi Hee; Park, Bong Joo; Jin, Soo Chang; Kim, Dohyun; Kim, Jungsung; Park, Jong-Chul; Han, Inho; Hyun, Soon O; Chung, Kie-Hyung

    2009-01-01

    Microbial biofilms are a functional matrix of microbial cells, enveloped in polysaccharides, enzymes and virulence factors secreted by them that can develop on indwelling medical devices and biomaterials. Plasma sterilization has been widely studied in recent years for biological applications. In this study, we evaluated the possibility of removal and anti-recovery of biofilms by microwave-induced argon plasma at atmospheric pressure. We observed that all bacterial biofilms formatted by Gram-negative and Gram-positive bacteria are removed in less than 20 s, and the growth inhibitions of planktonic bacteria within biofilms are also confirmed by plasma exposure for 5 s. These results suggest that our plasma system can be applied to medical and biological fields where the removal of biofilms and their debris is required.

  1. Silicon nitride gradient film as the underlayer of ultra-thin tetrahedral amorphous carbon overcoat for magnetic recording slider

    Energy Technology Data Exchange (ETDEWEB)

    Wang Guigen, E-mail: wanggghit@yahoo.com [Shenzhen Graduate School, Harbin Institute of Technology, Shenzhen 518055 (China); Kuang Xuping; Zhang Huayu; Zhu Can [Shenzhen Graduate School, Harbin Institute of Technology, Shenzhen 518055 (China); Han Jiecai [Shenzhen Graduate School, Harbin Institute of Technology, Shenzhen 518055 (China); Center for Composite Materials, Harbin Institute of Technology, Harbin 150080 (China); Zuo Hongbo [Center for Composite Materials, Harbin Institute of Technology, Harbin 150080 (China); Ma Hongtao [SAE Technologies Development (Dongguan) Co., Ltd., Dongguan 523087 (China)

    2011-12-15

    Highlights: Black-Right-Pointing-Pointer The ultra-thin carbon films with different silicon nitride (Si-N) film underlayers were prepared. Black-Right-Pointing-Pointer It highlighted the influences of Si-N underlayers. Black-Right-Pointing-Pointer The carbon films with Si-N underlayers obtained by nitriding especially at the substrate bias of -150 V, can exhibit better corrosion protection properties - Abstract: There are higher technical requirements for protection overcoat of magnetic recording slider used in high-density storage fields for the future. In this study, silicon nitride (Si-N) composition-gradient films were firstly prepared by nitriding of silicon thin films pre-sputtered on silicon wafers and magnetic recording sliders, using microwave electron cyclotron resonance plasma source. The ultra-thin tetrahedral amorphous carbon films were then deposited on the Si-N films by filtered cathodic vacuum arc method. Compared with amorphous carbon overcoats with conventional silicon underlayers, the overcoats with Si-N underlayers obtained by plasma nitriding especially at the substrate bias of -150 V, can provide better corrosion protection for high-density magnetic recording sliders.

  2. Silicon nitride gradient film as the underlayer of ultra-thin tetrahedral amorphous carbon overcoat for magnetic recording slider

    International Nuclear Information System (INIS)

    Wang Guigen; Kuang Xuping; Zhang Huayu; Zhu Can; Han Jiecai; Zuo Hongbo; Ma Hongtao

    2011-01-01

    Highlights: ► The ultra-thin carbon films with different silicon nitride (Si-N) film underlayers were prepared. ► It highlighted the influences of Si-N underlayers. ► The carbon films with Si-N underlayers obtained by nitriding especially at the substrate bias of −150 V, can exhibit better corrosion protection properties - Abstract: There are higher technical requirements for protection overcoat of magnetic recording slider used in high-density storage fields for the future. In this study, silicon nitride (Si-N) composition-gradient films were firstly prepared by nitriding of silicon thin films pre-sputtered on silicon wafers and magnetic recording sliders, using microwave electron cyclotron resonance plasma source. The ultra-thin tetrahedral amorphous carbon films were then deposited on the Si-N films by filtered cathodic vacuum arc method. Compared with amorphous carbon overcoats with conventional silicon underlayers, the overcoats with Si-N underlayers obtained by plasma nitriding especially at the substrate bias of −150 V, can provide better corrosion protection for high-density magnetic recording sliders.

  3. Ultralow field emission from thinned, open-ended, and defected carbon nanotubes by using microwave hydrogen plasma processing

    Energy Technology Data Exchange (ETDEWEB)

    Deng, Jian-Hua, E-mail: jhdeng1983@163.com [College of Physics and Materials Science, Tianjin Normal University, Tianjin 300387 (China); Cheng, Lin; Wang, Fan-Jie; Yu, Bin; Li, Guo-Zheng; Li, De-Jun [College of Physics and Materials Science, Tianjin Normal University, Tianjin 300387 (China); Cheng, Guo-An [Key Laboratory of Beam Technology and Material Modification of Ministry of Education, Beijing Normal University, Beijing 100875 (China)

    2015-01-01

    Graphical abstract: Thinned, open-ended, and defected carbon nanotubes were prepared by using hydrogen plasma processing. The processed carbon nanotubes have far better field emission performance than that of the pristine ones. - Highlights: • CVD prepared CNT arrays were processed by microwave hydrogen plasma. • Thinned, open-ended, and defected CNTs were obtained. • Processed CNTs have far better field emission performance than the pristine ones. • Processed CNTs have applicable emission stability after being perfectly aged. - Abstract: Ultralow field emission is achieved from carbon nanotubes (CNTs) by using microwave hydrogen plasma processing. After the processing, typical capped CNT tips are removed, with thinned, open-ended, and defected CNTs left. Structural analyses indicate that the processed CNTs have more SP{sup 3}-hybridized defects as compared to the pristine ones. The morphology of CNTs can be readily controlled by adjusting microwave powers, which change the shape of CNTs by means of hydrogen plasma etching. Processed CNTs with optimal morphology are found to have an ultralow turn-on field of 0.566 V/μm and threshold field of 0.896 V/μm, much better than 0.948 and 1.559 V/μm of the as-grown CNTs, respectively. This improved FE performance is ascribed to the structural changes of CNTs after the processing. The thinned and open-ended shape of CNTs can facilitate electron tunneling through barriers and additionally, the increased defects at tube walls can serve as new active emission sites. Furthermore, our plasma processed CNTs exhibit excellent field emission stability at a large emission current density of 10.36 mA/cm{sup 2} after being perfectly aged, showing promising prospects in applications as high-performance vacuum electron sources.

  4. Visible-light photocatalytic activity of nitrided TiO2 thin films

    International Nuclear Information System (INIS)

    Camps, Enrique; Escobar-Alarcon, L.; Camacho-Lopez, Marco Antonio; Casados, Dora A. Solis

    2010-01-01

    TiO 2 thin films have been applied in UV-light photocatalysis. Nevertheless visible-light photocatalytic activity would make this material more attractive for applications. In this work we present results on the modification of titanium oxide (anatase) sol-gel thin films, via a nitriding process using a microwave plasma source. After the treatment in the nitrogen plasma, the nitrogen content in the TiO 2 films varied in the range from 14 up to 28 at%. The titanium oxide films and the nitrided ones were characterized by XPS, micro-Raman spectroscopy and UV-vis spectroscopy. Photocatalytic activity tests were done using a Methylene Blue dye solution, and as catalyst TiO 2 and nitrided TiO 2 films. The irradiation of films was carried out with a lamp with emission in the visible (without UV). The results showed that the nitrided TiO 2 films had photocatalytic activity, while the unnitrided films did not.

  5. Carbon diffusion in uncoated and titanium nitride coated iron substrates during microwave plasma assisted chemical vapor deposition of diamond

    International Nuclear Information System (INIS)

    Weiser, P.S.; Prawer, S.; Manory, R.R.; Paterson, P.J.K.; Stuart, Sue-Anne

    1992-01-01

    Auger Electron Spectroscopy has been employed to investigate the effectiveness of thin films of TiN as barriers to carbon diffusion during Chemical Vapor Deposition (CVD) of diamond onto Fe substrates. Auger Depth Profiling was used to monitor the C concentration in the TiN layer, through the interface and into the substrate both before and after CVD diamond deposition. The results show that a layer of TiN only 250 Angstroems thick is sufficient to inhibit soot formation on the Fe surface and C diffusion into the Fe bulk. 14 refs., 4 figs

  6. Spark plasma sintering and microwave electromagnetic properties of MnFe{sub 2}O{sub 4} ceramics

    Energy Technology Data Exchange (ETDEWEB)

    Penchal Reddy, M., E-mail: drlpenchal@gmail.com [Center for Advanced Materials, Qatar University, Doha 2713 (Qatar); Mohamed, A.M.A. [Center for Advanced Materials, Qatar University, Doha 2713 (Qatar); Department of Metallurgical and Materials Engineering, Faculty of Petroleum and Mining Engineering, Suez University, Suez 4372 (Egypt); Venkata Ramana, M. [Department of Physics, National Taiwan Normal University, Taipei 11677, Taiwan (China); Zhou, X.B.; Huang, Q. [Division of Functional Materials and Nanodevices, Ningbo Institute of Materials Technology and Engineering, Ningbo 315201 (China)

    2015-12-01

    MnFe{sub 2}O{sub 4} ferrite powder was synthesized by a facile one-pot hydrothermal route and then consolidated into dense nanostructured compacts by the spark plasma sintering (SPS) technique. The effect of sintering temperature, on densification, morphology, magnetic and microwave absorption properties was examined. Spark plasma sintering resulted in uniform microstructure, as well as maximum relative density of 98%. The magnetic analysis indicated that the MnFe{sub 2}O{sub 4} ferrite nanoparticles showed ferrimagnetic behavior. Moreover, the dielectric loss and magnetic loss properties of MnFe{sub 2}O{sub 4} ferrite nanoparticles were both enhanced due to its better dipole polarization, interfacial polarization and shape anisotropy. It is believed that such spark plasma sintered ceramic material will be applied widely in microwave absorbing area. - Highlights: • Successful synthesis of dense MnFe{sub 2}O{sub 4} ceramics using spark plasma sintering. • Lower temperature and shorter sintering time, compared to conventional methods. • Optimal sintering condition was achieved. • The magnetic properties of the sintered samples are sensitive to the density and microstructure.

  7. Characterization and modeling of multi-dipolar microwave plasmas: application to multi-dipolar plasma assisted sputtering; Caracterisation et modelisation des plasmas micro-onde multi-dipolaires: application a la pulverisation assistee par plasma multi-dipolaire

    Energy Technology Data Exchange (ETDEWEB)

    Tran, T.V

    2006-12-15

    The scaling up of plasma processes in the low pressure range remains a question to be solved for their rise at the industrial level. One solution is the uniform distribution of elementary plasma sources where the plasma is produced via electron cyclotron resonance (ECR) coupling. These elementary plasma sources are made up of a cylindrical permanent magnet (magnetic dipole) set at the end of a coaxial microwave line. Although of simple concept, the optimisation of these dipolar plasma sources is in fact a complex problem. It requires the knowledge, on one hand, of the configurations of static magnetic fields and microwave electric fields, and, on the other hand, of the mechanisms of plasma production in the region of high intensity magnetic field (ECR condition), and of plasma diffusion. Therefore, the experimental characterisation of the operating ranges and plasma parameters has been performed by Langmuir probes and optical emission spectroscopy on different configurations of dipolar sources. At the same time, in a first analytical approach, calculations have been made on simple magnetic field configurations, motion and trajectory of electrons in these magnetic fields, and the acceleration of electrons by ECR coupling. Then, the results have been used for the validation of the numerical modelling of the electron trajectories by using a hybrid PIC (particle-in-cell) / MC (Monte Carlo) method. The experimental study has evidenced large operating domains, between 15 and 200 W of microwave power, and from 0.5 to 15 mtorr argon pressure. The analysis of plasma parameters has shown that the region of ECR coupling is localised near the equatorial plane of the magnet and dependent on magnet geometry. These characterizations, applied to a cylindrical reactor using 48 sources, have shown that densities between 10{sup 11} and 10{sup 12} cm{sup -3} could be achieved in the central part of the volume at a few mtorr argon pressures. The modelling of electron trajectories near

  8. Effects of bias voltage on the corrosion resistance of titanium nitride thin films fabricated by dynamic plasma immersion ion implantation-deposition

    International Nuclear Information System (INIS)

    Tian Xiubo; Fu, Ricky K. Y.; Chu, Paul K.

    2002-01-01

    Dynamic plasma-based thin-film deposition incorporating ion mixing and plasma immersion is an effective technique to synthesize nitride-based hard films. We have fabricated TiN films using a filtered titanium vacuum arc in a nitrogen plasma environment. A pulsed high voltage is applied to the target for a short time when the metallic arc is fired to attain simultaneous plasma deposition and ion mixing. We investigate the dependence of the corrosion resistance and interfacial structure of the treated samples on the applied voltage. Our Auger results reveal an oxygen-rich surface film due to the non-ultra-high-vacuum conditions and high affinity of oxygen to titanium. The corrosion current is reduced by two orders of magnitude comparing the sample processed at 8 kV to the untreated sample, but the 23 kV sample unexpectedly shows worse results. The pitting potential diminishes substantially although the corrosion current is similar to that observed in the 8 kV sample. The polarization test data are consistent with our scanning electron microscopy observation, corroborating the difference in the pitting distribution and appearance. This anomalous behavior is believed to be due to the change in the chemical composition as a result of high-energy ion bombardment

  9. ORNL TNS program: microwave start-up of tokamak plasmas near electron cyclotron and upper hybrid resonances

    International Nuclear Information System (INIS)

    Peng, Y.K.M.; Borowski, S.K.

    1977-12-01

    The scenario of toroidal plasma start-up with microwave initiation and heating near the electron cyclotron frequency is suggested and examined here. We assume microwave irradiation from the high field side and an anomalously large absorption of the extraordinary waves near the upper hybrid resonance. The dominant electron energy losses are assumed to be due to magnetic field curvature and parallel drifts, ionization of neutrals, cooling by ions, and radiation by low Z impurities. It is shown by particle and energy balance considerations that electron temperatures around 250 eV and densities of 10 12 to 10 13 cm -3 can be maintained, at least in a narrow region near the upper hybrid resonance, with modest microwave powers in the Impurity Study Experiment (ISX) (120 kW at 28 GHz) and The Next Step (TNS) (0.57 MW at 120 GHz). The loop voltages required for start-up from these initial plasmas are also estimated. It is shown that the loop voltage can be reduced by a factor of five to ten from that for unassisted start-up without an increase in the resistive loss in volt-seconds. If this reduction in loop voltage is verified in the ISX experiments, substantial savings in the cost of power supplies for the ohmic heating (OH) and equilibrium field (EF) coils can be realized in future large tokamaks

  10. Plasma nitriding process by direct current glow discharge at low temperature increasing the thermal diffusivity of AISI 304 stainless steel

    Energy Technology Data Exchange (ETDEWEB)

    Prandel, L. V.; Somer, A.; Assmann, A.; Camelotti, F.; Costa, G.; Bonardi, C.; Jurelo, A. R.; Rodrigues, J. B.; Cruz, G. K. [Universidade Estadual de Ponta Grossa, Grupo de Espectroscopia Optica e Fotoacustica de Materiais, Departamento de Fisica, Av. Carlos Cavalcanti, 4748, CEP 84030-900, Ponta Grossa, PR (Brazil)

    2013-02-14

    This work reports for the first time on the use of the open photoacoustic cell technique operating at very low frequencies and at room temperature to experimentally determine the thermal diffusivity parameter of commercial AISI304 stainless steel and AISI304 stainless steel nitrided samples. Complementary measurements of X-ray diffraction and scanning electron microscopy were also performed. The results show that in standard AISI 304 stainless steel samples the thermal diffusivity is (4.0 {+-} 0.3) Multiplication-Sign 10{sup -6} m{sup 2}/s. After the nitriding process, the thermal diffusivity increases to the value (7.1 {+-} 0.5) Multiplication-Sign 10{sup -6} m{sup 2}/s. The results are being associated to the diffusion process of nitrogen into the surface of the sample. Carrying out subsequent thermal treatment at 500 Degree-Sign C, the thermal diffusivity increases up to (12.0 {+-} 2) Multiplication-Sign 10{sup -6} m{sup 2}/s. Now the observed growing in the thermal diffusivity must be related to the change in the phases contained in the nitrided layer.

  11. Study of the ion density of a radio-frequency plasma using electrostatic probes and focussed microwave interferometers

    International Nuclear Information System (INIS)

    Nguyen Cao, L.; Gagne, R.R.J.

    1976-01-01

    In order to verify experimentally and compare recent ion theories for cylindrical electrostatic probes, the ion density in a radio-frequency plasma was evaluated from V-I